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Sample records for 11-22 semipolar gan

  1. Successive selective growth of semipolar (11-22) GaN on patterned sapphire substrate

    NASA Astrophysics Data System (ADS)

    Tendille, Florian; Hugues, Maxime; Vennéguès, Philippe; Teisseire, Monique; De Mierry, Philippe

    2015-06-01

    Thanks to the use of two successive selective growths by metal organic chemical vapor deposition reactor, high quality semipolar (11-22) GaN with a homogenous defect repartition over the surface was achieved. The procedure starts with a first selective growth on a patterned sapphire substrate, leading to continuous stripes of three dimensional (3D) GaN crystals of low defect density. Then, a second selective growth step is achieved by depositing a SiNx nano-mask and a low temperature GaN nano-layer on the top of the GaN stripes. Hereby, we demonstrate an original way to obtain a homoepitaxial selective growth on 3D GaN crystals by taking advantage of the different crystallographic planes available. Basal stacking faults (BSFs) are generated during this second selective growth but could be eliminated by using a three-step growth method in which elongated voids are created above the defective area. For a fully coalesced sample grown using the 2 step method, dislocation density of 1.2 × 108 cm-2 and BSFs density of 154 cm-1 with a homogenous distribution have been measured by cathodoluminescence at 80 K. Consequently the material quality of this coalesced semipolar layer is comparable to the one of polar GaN on c-plane sapphire.

  2. Crystallographic Wet Chemical Etching of Semipolar GaN (11-22) Grown on m-Plane Sapphire Substrates.

    PubMed

    Kim, Jae-Kwan; Lee, Sung Nam; Song, Keun-Man; Yoon, Jae-Sik; Lee, Ji-Myon

    2015-07-01

    This paper reports the etch rates and etched surface morphology of semipolar GaN using a potassium hydroxide (KOH) solution. Semipolar (11-22) GaN could be etched easily using a KOH solution and the etch rate was higher than that of Ga-polar c-plane GaN (0001). The etch rate was anisotropic and the highest etch rate was measured to be approximately 116 nm/min for the (1011) plane and 62 nm/min for the (11-20) plane GaN using a 4 M KOH solution at 100 °C, resulting in specific surface features, such as inclined trigonal cells. PMID:26373117

  3. Growth and characterization of semi-polar (11-22) GaN on patterned (113) Si substrates

    NASA Astrophysics Data System (ADS)

    Bai, J.; Yu, X.; Gong, Y.; Hou, Y. N.; Zhang, Y.; Wang, T.

    2015-06-01

    Patterned (113) Si substrates have been fabricated for the growth of (11-22) semi-polar GaN, which completely eliminates one of the great issues in the growth of semi-polar GaN on silicon substrates, ‘Ga melting-back’. Furthermore, unlike any other mask patterning approaches which normally lead to parallel grooves along a particular orientation, our approach is to form periodic square window patterns. As a result, crack-free semi-polar (11-22) GaN with a significant improvement in crystal quality has been achieved, in particular, basal stacking faults (BSFs) have been significantly reduced. The mechanism for the defect suppression has been investigated based on detailed transmission electron microscopy measurements. It has been found that the BSFs can be impeded effectively at an early growth stage due to the priority growth along the <0001> direction. The additional <1-100> lateral growth above the masks results in a further reduction in dislocation density. The significant reduction in BSFs has been confirmed by low temperature photoluminescence measurements.

  4. Study of defect management in the growth of semipolar (11-22) GaN on patterned sapphire

    NASA Astrophysics Data System (ADS)

    Vennéguès, P.; Tendille, F.; De Mierry, P.

    2015-08-01

    This work describes, using mainly transmission electron microscopy as an investigation tool, the nature and behaviour of the crystalline defects which are present in (11-22) semipolar GaN films grown epitaxially on patterned r-sapphire substrates using a 3 step growth process. The microstructure at these different growth stages is described. The independent 3D-crystallites nucleated on the substrate surface contain threading dislocations resulting from the epitaxy on c-sapphire facets and basal stacking faults (BSFs), mainly in the  -c-wings. These defects are concentrated in a few hundred nanometre wide stripe-like regions emerging on the top facet of the islands. By a careful choice of the growth conditions, these defective regions may be overgrown by defect-free material, blocking their propagation towards the coalesced surface. However, when the 3D crystals coalesce, new dislocations together with very few BSFs are created at the coalescence boundaries. These coalescence defects propagate to the surface of the films in (0001) planes. In summary, the control of the nucleation and propagation of the crystalline defects allows obtaining large area semipolar films with very low defect densities: 7   ×   107 cm-2 for TDs and 70 cm-1 for BSFs.

  5. Anisotropic structural and optical properties of semi-polar (11-22) GaN grown on m-plane sapphire using double AlN buffer layers

    NASA Astrophysics Data System (ADS)

    Zhao, Guijuan; Wang, Lianshan; Yang, Shaoyan; Li, Huijie; Wei, Hongyuan; Han, Dongyue; Wang, Zhanguo

    2016-02-01

    We report the anisotropic structural and optical properties of semi-polar (11-22) GaN grown on m-plane sapphire using a three-step growth method which consisted of a low temperature AlN buffer layer, followed by a high temperature AlN buffer layer and GaN growth. By introducing double AlN buffer layers, we substantially improve the crystal and optical qualities of semi-polar (11-22) GaN, and significantly reduce the density of stacking faults and dislocations. The high resolution x-ray diffraction measurement revealed that the in-plane anisotropic structural characteristics of GaN layer are azimuthal dependent. Transmission electron microscopy analysis showed that the majority of dislocations in the GaN epitaxial layer grown on m-sapphire are the mixed-type and the orientation of GaN layer was rotated 58.4° against the substrate. The room temperature photoluminescence (PL) spectra showed the PL intensity and wavelength have polarization dependence along parallel and perpendicular to the [1-100] axis (polarization degrees ~ 0.63). The realization of a high polarization semi-polar GaN would be useful to achieve III-nitride based lighting emission device for displays and backlighting.

  6. Anisotropic structural and optical properties of semi-polar (11-22) GaN grown on m-plane sapphire using double AlN buffer layers.

    PubMed

    Zhao, Guijuan; Wang, Lianshan; Yang, Shaoyan; Li, Huijie; Wei, Hongyuan; Han, Dongyue; Wang, Zhanguo

    2016-01-01

    We report the anisotropic structural and optical properties of semi-polar (11-22) GaN grown on m-plane sapphire using a three-step growth method which consisted of a low temperature AlN buffer layer, followed by a high temperature AlN buffer layer and GaN growth. By introducing double AlN buffer layers, we substantially improve the crystal and optical qualities of semi-polar (11-22) GaN, and significantly reduce the density of stacking faults and dislocations. The high resolution x-ray diffraction measurement revealed that the in-plane anisotropic structural characteristics of GaN layer are azimuthal dependent. Transmission electron microscopy analysis showed that the majority of dislocations in the GaN epitaxial layer grown on m-sapphire are the mixed-type and the orientation of GaN layer was rotated 58.4° against the substrate. The room temperature photoluminescence (PL) spectra showed the PL intensity and wavelength have polarization dependence along parallel and perpendicular to the [1-100] axis (polarization degrees ~ 0.63). The realization of a high polarization semi-polar GaN would be useful to achieve III-nitride based lighting emission device for displays and backlighting. PMID:26861595

  7. (11-22) semipolar InGaN emitters from green to amber on overgrown GaN on micro-rod templates

    SciTech Connect

    Bai, J. Xu, B.; Guzman, F. G.; Xing, K.; Gong, Y.; Hou, Y.; Wang, T.

    2015-12-28

    We demonstrate semipolar InGaN single-quantum-well light emitting diodes (LEDs) in the green, yellow-green, yellow and amber spectral region. The LEDs are grown on our overgrown semipolar (11-22) GaN on micro-rod array templates, which are fabricated on (11-22) GaN grown on m-plane sapphire. Electroluminescence measurements on the (11-22) green LED show a reduced blue-shift in the emission wavelength with increasing driving current, compared to a reference commercial c-plane LED. The blue-shifts for the yellow-green and yellow LEDs are also significantly reduced. All these suggest an effective suppression in quantum confined Stark effect in our (11-22) LEDs. On-wafer measurements yield a linear increase in the light output with the current, and external quantum efficiency demonstrates a significant improvement in the efficiency-droop compared to a commercial c-plane LED. Electro-luminescence polarization measurements show a polarization ratio of about 25% in our semipolar LEDs.

  8. (11-22) semipolar InGaN emitters from green to amber on overgrown GaN on micro-rod templates

    NASA Astrophysics Data System (ADS)

    Bai, J.; Xu, B.; Guzman, F. G.; Xing, K.; Gong, Y.; Hou, Y.; Wang, T.

    2015-12-01

    We demonstrate semipolar InGaN single-quantum-well light emitting diodes (LEDs) in the green, yellow-green, yellow and amber spectral region. The LEDs are grown on our overgrown semipolar (11-22) GaN on micro-rod array templates, which are fabricated on (11-22) GaN grown on m-plane sapphire. Electroluminescence measurements on the (11-22) green LED show a reduced blue-shift in the emission wavelength with increasing driving current, compared to a reference commercial c-plane LED. The blue-shifts for the yellow-green and yellow LEDs are also significantly reduced. All these suggest an effective suppression in quantum confined Stark effect in our (11-22) LEDs. On-wafer measurements yield a linear increase in the light output with the current, and external quantum efficiency demonstrates a significant improvement in the efficiency-droop compared to a commercial c-plane LED. Electro-luminescence polarization measurements show a polarization ratio of about 25% in our semipolar LEDs.

  9. Defect reduction in (11-22) semipolar GaN with embedded InN islands on m-plane sapphire

    NASA Astrophysics Data System (ADS)

    Jung, Chilsung; Jang, Jongjin; Hwang, Junghwan; Jeong, Joocheol; Kim, Jinwan; Lee, kyungjae; Nam, Okhyun

    2013-05-01

    This paper reports on the improved properties of semipolar (11-22) GaN with embedded InN islands on m-plane sapphire substrate. The crystal quality of GaN grown over embedded InN islands was improved by the defect blocking mechanism that the InN islands stop from propagating of dislocations. The full width at half maximum (FWHM) of X-ray rocking curves for the on- and off-axes planes of GaN with embedded InN islands significantly narrowed. The photoluminescence (PL) intensity of GaN with embedded InN islands increased by 28% compared with that of GaN without InN islands (reference GaN). The n-type GaN carrier mobility was analyzed by using temperature-dependent Hall effect measurement. The increase in peak mobility at 350 K from 104 to 113 cm2/Vs with embedded islands also suggested the effectiveness of embedded InN islands in GaN. LEDs fabricated on (11-22) GaN with embedded InN islands showed approximately 2.7 times higher optical output power than the reference LED at 100 mA.

  10. Defect reduction in overgrown semi-polar (11-22) GaN on a regularly arrayed micro-rod array template

    NASA Astrophysics Data System (ADS)

    Zhang, Y.; Bai, J.; Hou, Y.; Smith, R. M.; Yu, X.; Gong, Y.; Wang, T.

    2016-02-01

    We demonstrate a great improvement in the crystal quality of our semi-polar (11-22) GaN overgrown on regularly arrayed micro-rod templates fabricated using a combination of industry-matched photolithography and dry-etching techniques. As a result of our micro-rod configuration specially designed, an intrinsic issue on the anisotropic growth rate which is a great challenge in conventional overgrowth technique for semi-polar GaN has been resolved. Transmission electron microscopy measurements show a different mechanism of defect reduction from conventional overgrowth techniques and also demonstrate major advantages of our approach. The dislocations existing in the GaN micro-rods are effectively blocked by both a SiO2 mask on the top of each GaN micro-rod and lateral growth along the c-direction, where the growth rate along the c-direction is faster than that along any other direction. Basal stacking faults (BSFs) are also effectively impeded, leading to a distribution of BSF-free regions periodically spaced by BSF regions along the [-1-123] direction, in which high and low BSF density areas further show a periodic distribution along the [1-100] direction. Furthermore, a defect reduction model is proposed for further improvement in the crystalline quality of overgrown (11-22) GaN on sapphire.

  11. Improved luminescence and thermal stability of semipolar (11-22) InGaN quantum dots

    SciTech Connect

    Das, A.; Kotsar, Y.; Monroy, E.

    2011-05-16

    Semipolar (11-22)-oriented InGaN/GaN quantum dots (QDs) emitting in the 380-620 nm spectral range were synthesized by plasma-assisted molecular-beam epitaxy. The influence of the growth temperature on the properties of InGaN QDs has been investigated by photoluminescence and transmission electron microscopy. Growth temperatures low enough to prevent indium desorption provide a favorable environment to semipolar plane (11-22) to enhance the internal quantum efficiency of InGaN/GaN nanostructures.

  12. Study of green light-emitting diodes grown on semipolar (11-22) GaN/m-sapphire with different crystal qualities

    NASA Astrophysics Data System (ADS)

    Oh, Dong-Sub; Jang, Jong-Jin; Nam, Okhyun; Song, Keun-Man; Lee, Sung-Nam

    2011-07-01

    We investigated the anisotropic optical and structural properties of semipolar (11-22) InGaN-based green light emitting diodes (LEDs) grown on GaN templates with the different crystallographic properties. By introducing the N 2-GaN as a seed layer grown at a N 2 atmosphere, the full width at half maximum (FWHMs) of X-ray rocking curves (XRCs) for semipolar GaN templates were decreased from 1331 to 727 arcsec and from 1955 to 1076 arcsec with the incident beam directions of [11-2-3] and [1-100], respectively. It was found that the interfacial qualities of InGaN/GaN quantum wells (QWs) would be improved by reducing the FWHMs of XRCs with regardless of crystallographic directions. However, the thickness uniformity of InGaN QWs was significantly deteriorated for the direction of [11-2-3] rather than [1-100]. In addition, the EL intensity of semipolar green LEDs would be increased by enhancing the crystal quality of semipolar GaN template, which could also be resulted in the formation of abrupt interface and the enhancement of homogeneity at InGaN/GaN QWs.

  13. Improved performance of semi-polar (11-22) GaN-based light-emitting diodes grown on SiNx interlayer

    NASA Astrophysics Data System (ADS)

    Jeong, Joocheol; Jang, Jongjin; Hwang, Jungwhan; Jung, Chilsung; Kim, Jinwan; Lee, Kyungjae; Lim, Hyoungjin; Nam, Okhyun

    2013-05-01

    We report on the effectiveness of the in-situ SiNx nanomask in reducing defects in semipolar (11-22) GaN films grown on m-plane sapphire. The properties of the semipolar InGaN/GaN double quantum well (DQW) LEDs were improved with a high-quality (11-22) GaN epilayer grown on the SiNx interlayer. High resolution X-ray diffraction analysis revealed that there was a great reduction in the full width at half maximum of both on-axis and off-axis planes on SiNx interlayer. The room temperature cathodoluminescence (CL) band-edge emission intensity of (11-22) GaN grown on the SiNx interlayer was approximately 4 times higher than that of GaN without the SiNx interlayer, which suggests reduction in the nonradiative recombination centers. The optical power of LEDs with the SiNx interlayer was 200% and 270% higher at injection currents of 20 mA and 100 mA, respectively, compared to the reference LEDs.

  14. Controlling optical polarization of {11-22} semipolar multiple quantum wells using relaxed underlying InGaN buffer layers

    NASA Astrophysics Data System (ADS)

    Okada, Narihito; Okamura, Yasuhiro; Uchida, Katsumi; Tadatomo, Kazuyuki

    2016-08-01

    We successfully fabricated {11-22} multiple quantum wells (MQWs) having different emission peak wavelengths on partially or completely relaxed thick InGaN buffer layers with different In contents formed on a semipolar {11-22} GaN layer, which was grown on a patterned r-plane sapphire substrate. The polarization properties changed significantly with changing in In content and thickness for InGaN buffer layer. For the same In content of the InGaN buffer layer, the optical polarization changed with an increase in the thickness of the underlying InGaN buffer layer, indicating a change in the relaxation ratio of the InGaN buffer layer. Similarly, for the same thickness of the InGaN buffer layer, the optical polarization changed by changing In content of the InGaN buffer layer. Thus, the degree of optical polarization could be controlled by varying the In content of the underlying InGaN buffer layer.

  15. Indium-incorporation efficiency in semipolar (11-22) oriented InGaN-based light emitting diodes

    NASA Astrophysics Data System (ADS)

    Monavarian, Morteza; Metzner, Sebastian; Izyumskaya, Natalia; Okur, Serdal; Zhang, Fan; Can, Nuri; Das, Saikat; Avrutin, Vitaliy; Özgür, Ümit; Bertram, Frank; Christen, Jürgen; Morkoç, Hadis

    2015-03-01

    Reduced electric field in semipolar (1122) GaN/InGaN heterostructures makes this orientation attractive for high efficiency light emitting diodes. In this work, we investigated indium incorporation in semipolar (1122) GaN grown by metal-organic chemical vapor deposition on planar m-plane sapphire substrates. Indium content in the semipolar material was compared with that in polar c-plane samples grown under the same conditions simultaneously side by side on the same holder. The investigated samples incorporated dual GaN/InGaN/GaN double heterostructures with 3nm wide wells. In order to improve optical quality, both polar and semipolar templates were grown using an in-situ epitaxial lateral overgrowth (ELO) technique. Indium incorporation efficiency was derived from the comparison of PL spectra measured on the semipolar and polar structures at the highest excitation density, which allowed us to minimize the effect of quantum confined Stark effect on the emission wavelength. Our data suggests increased indium content in the semipolar material by up to 3.0%, from 15% In in c- GaN to 18% In in (1122) GaN.

  16. Semipolar and nonpolar GaN epi-films grown on m-sapphire by plasma assisted molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Mukundan, Shruti; Mohan, Lokesh; Chandan, Greeshma; Roul, Basanta; Krupanidhi, S. B.

    2014-11-01

    We hereby report the development of non-polar epi-GaN films of usable quality, on an m-plane sapphire. Generally, it is difficult to obtain high-quality nonpolar material due to the planar anisotropic nature of the growth mode. However, we could achieve good quality epi-GaN films by involving controlled steps of nitridation. GaN epilayers were grown on m-plane (10-10) sapphire substrates using plasma assisted molecular beam epitaxy. The films grown on the nitridated surface resulted in a nonpolar (10-10) orientation while without nitridation caused a semipolar (11-22) orientation. Room temperature photoluminescence study showed that nonpolar GaN films have higher value of compressive strain as compared to semipolar GaN films, which was further confirmed by room temperature Raman spectroscopy. The room temperature UV photodetection of both films was investigated by measuring the I-V characteristics under UV light illumination. UV photodetectors fabricated on nonpolar GaN showed better characteristics, including higher external quantum efficiency, compared to photodetectors fabricated on semipolar GaN. X-ray rocking curves confirmed better crystallinity of semipolar as compared to nonpolar GaN which resulted in faster transit response of the device.

  17. Semipolar and nonpolar GaN epi-films grown on m-sapphire by plasma assisted molecular beam epitaxy

    SciTech Connect

    Mukundan, Shruti; Mohan, Lokesh; Chandan, Greeshma; Krupanidhi, S. B.; Roul, Basanta

    2014-11-28

    We hereby report the development of non-polar epi-GaN films of usable quality, on an m-plane sapphire. Generally, it is difficult to obtain high-quality nonpolar material due to the planar anisotropic nature of the growth mode. However, we could achieve good quality epi-GaN films by involving controlled steps of nitridation. GaN epilayers were grown on m-plane (10-10) sapphire substrates using plasma assisted molecular beam epitaxy. The films grown on the nitridated surface resulted in a nonpolar (10-10) orientation while without nitridation caused a semipolar (11-22) orientation. Room temperature photoluminescence study showed that nonpolar GaN films have higher value of compressive strain as compared to semipolar GaN films, which was further confirmed by room temperature Raman spectroscopy. The room temperature UV photodetection of both films was investigated by measuring the I-V characteristics under UV light illumination. UV photodetectors fabricated on nonpolar GaN showed better characteristics, including higher external quantum efficiency, compared to photodetectors fabricated on semipolar GaN. X-ray rocking curves confirmed better crystallinity of semipolar as compared to nonpolar GaN which resulted in faster transit response of the device.

  18. Stability of Carbon Incorpoated Semipolar GaN(1101) Surface

    NASA Astrophysics Data System (ADS)

    Akiyama, Toru; Nakamura, Kohji; Ito, Tomonori

    2011-08-01

    The structural stability of carbon incorporated GaN(1101) surfaces is theoretically investigated by performing first-principles pseudopotential calculations. The calculated surface formation energies taking account of the metal organic vapor phase epitaxy conditions demonstrate that several carbon incorporated surfaces are stabilized depending on the growth conditions. Using surface phase diagrams, which are obtained by comparing the calculated adsorption energy with vapor-phase chemical potentials, we find that the semipolar surface forms NH2 and CH2 below ˜1660 K while the polar GaN(0001) surface with CH3 is stabilized below ˜1550 K. This difference could be one of possible explanations for p-type doping on the semipolar GaN(1101) surface.

  19. Mg doping and its effect on the semipolar GaN(1122) growth kinetics

    SciTech Connect

    Lahourcade, L.; Wirthmueller, A.; Monroy, E.; Chauvat, M. P.; Ruterana, P.; Laufer, A.; Eickhoff, M.

    2009-10-26

    We report the effect of Mg doping on the growth kinetics of semipolar GaN(1122) synthesized by plasma-assisted molecular-beam epitaxy. Mg tends to segregate on the surface, inhibiting the formation of the self-regulated Ga film which is used as a surfactant for the growth of undoped and Si-doped GaN(1122). We observe an enhancement of Mg incorporation in GaN(1122) compared to GaN(0001). Typical structural defects or polarity inversion domains found in Mg-doped GaN(0001) were not observed for the semipolar films investigated in the present study.

  20. Selective-area growth of GaN on non- and semi-polar bulk GaN substrates

    NASA Astrophysics Data System (ADS)

    Okada, Shunsuke; Miyake, Hideto; Hiramatsu, Kazumasa; Enatsu, Yuuki; Nagao, Satoru

    2014-01-01

    We carried out the selective-area growth of GaN and fabricated InGaN/GaN MQWs on non- and semi-polar bulk GaN substrates by MOVPE. The differences in the GaN structures and the In incorporation of InGaN/GaN MQWs grown on non- and semi-polar GaN substrates were investigated. In the case of selective-area growth, different GaN structures were obtained on (20\\bar{2}1) GaN, (20\\bar{2}\\bar{1}) GaN, and (10\\bar{1}0) GaN substrates. A repeating pattern of \\{ 1\\bar{1}01\\} and \\{ 1\\bar{1}0\\bar{1}\\} facets appeared on (20\\bar{2}1) GaN. Then, we fabricated InGaN/GaN MQWs on the facet structures on (20\\bar{2}1) GaN. The emission properties characterized by cathodoluminescence were different for \\{ 1\\bar{1}01\\} and \\{ 1\\bar{1}0\\bar{1}\\} facets. On the other hand, for InGaN/GaN MQWs on non- and semi-polar GaN substrates, steps along the a-axis were observed by AFM. In particular on (20\\bar{2}1) GaN, undulations and undulation bunching appeared. Photoluminescence characterization indicated that In incorporation increased with the off-angle from the m-plane and also depended on the polarity.

  1. Hydrogen sensing characteristics of semipolar (112{sup ¯}2) GaN Schottky diodes

    SciTech Connect

    Hyeon Baik, Kwang; Kim, Hyonwoong; Jang, Soohwan; Lee, Sung-Nam; Lim, Eunju; Pearton, S. J.; Ren, F.

    2014-02-17

    The hydrogen detection characteristics of semipolar (112{sup ¯}2) plane GaN Schottky diodes were investigated and compared to c-plane Ga- and N-polar and nonpolar a-plane (112{sup ¯}0) GaN diodes. The semipolar GaN diodes showed large current response to 4% hydrogen in nitrogen gas with an accompanying Schottky barrier reduction of 0.53 eV at 25 °C, and the devices exhibited full recovery to the initial current level upon switching to a nitrogen ambient. The current-voltage characteristics of the semipolar devices remained rectifying after hydrogen exposure, in sharp contrast to the case of c-plane N-polar GaN. These results show that the surface atom configuration and polarity play a strong role in hydrogen sensing with GaN.

  2. Improvement of crystal quality and optical property in (11-22) semipolar InGaN/GaN LEDs grown on patterned m-plane sapphire substrate

    NASA Astrophysics Data System (ADS)

    Jang, Jongjin; Lee, Kwanhyun; Hwang, Junghwan; Jung, Joocheol; Lee, Seunga; Lee, Kyuho; Kong, Bohyun; Cho, Hyunghoun; Nam, Okhyun

    2012-12-01

    Semipolar GaN layers were grown on the m-plane hemispherical patterned sapphire substrates (HPSS) using metal organic chemical vapor deposition in order to reduce the defect density and enhance the extraction efficiency of light. The roughness values of the GaN surface grown on the planar sapphire and the HPSS were 30 and 23 nm root-mean-square roughness for a 20×20-μm2 area, respectively. The reduction of basal stacking fault density was demonstrated by x-ray rocking curve of off-axis planes and cross-sectional transmission electron microscopy. The low-temperature photoluminescence measurement showed that the near band-edge emission from HPSS semipolar GaN was approximately one order of magnitude stronger than that from planar semipolar GaN layer. The InGaN light emitting diode grown on the HPSS showed an output power approximately 1.5 times that on the planar m-sapphire.

  3. Using the kinetic Wulff plot to design and control nonpolar and semipolar GaN heteroepitaxy

    NASA Astrophysics Data System (ADS)

    Leung, Benjamin; Sun, Qian; Yerino, Christopher D.; Han, Jung; Coltrin, Michael E.

    2012-02-01

    For nonpolar and semipolar orientations of GaN heteroepitaxially grown on sapphire substrates, the development of growth procedures to improve surface morphology and microstructure has been driven in a largely empirical way. This work attempts to comprehensively link the intrinsic properties of GaN faceted growth, across orientations, in order to understand, design and control growth methods for nonpolar (1 1 2 0) GaN and semipolar (1 1 2 2) GaN on foreign substrates. This is done by constructing a comprehensive series of kinetic Wulff plots (or v-plots) by monitoring the advances of convex and concave facets in selective area growth. A methodology is developed to apply the experimentally determined v-plots to the interpretation and design of evolution dynamics in nucleation and island coalescence. This methodology offers a cohesive and rational model for GaN heteroepitaxy along polar, nonpolar and semipolar orientations, and is broadly extensible to the heteroepitaxy of other materials. We demonstrate furthermore that the control of morphological evolution, based on invoking a detailed knowledge of the v-plots, holds a key to the reduction of microstructural defects through effective bending of dislocations and blocking of stacking faults. The status and outlook of semipolar and nonpolar GaN growth on sapphire substrates will be presented.

  4. Ultraviolet light-emitting diodes grown by plasma-assisted molecular beam epitaxy on semipolar GaN (2021) substrates

    SciTech Connect

    Sawicka, M.; Grzanka, S.; Skierbiszewski, C.; Turski, H.; Muziol, G.; Krysko, M.; Grzanka, E.; Sochacki, T.; Siekacz, M.; Kucharski, R.

    2013-03-18

    Multi-quantum well (MQW) structures and light emitting diodes (LEDs) were grown on semipolar (2021) and polar (0001) GaN substrates by plasma-assisted molecular beam epitaxy. The In incorporation efficiency was found to be significantly lower for the semipolar plane as compared to the polar one. The semipolar MQWs exhibit a smooth surface morphology, abrupt interfaces, and a high photoluminescence intensity. The electroluminescence of semipolar (2021) and polar (0001) LEDs fabricated in the same growth run peaks at 387 and 462 nm, respectively. Semipolar LEDs with additional (Al,Ga)N cladding layers exhibit a higher optical output power but simultaneously a higher turn-on voltage.

  5. Semi-polar GaN materials technology for high IQE green LEDs.

    SciTech Connect

    Koleske, Daniel David; Lee, Stephen Roger; Crawford, Mary Hagerott; Coltrin, Michael Elliott; Fini, Paul

    2013-06-01

    The goal of this NETL funded program was to improve the IQE in green (and longer wavelength) nitride- based LEDs structures by using semi-polar GaN planar orientations for InGaN multiple quantum well (MQW) growth. These semi-polar orientations have the advantage of significantly reducing the piezoelectric fields that distort the QW band structure and decrease electron-hole overlap. In addition, semipolar surfaces potentially provide a more open surface bonding environment for indium incorporation, thus enabling higher indium concentrations in the InGaN MQW. The goal of the proposed work was to select the optimal semi-polar orientation and explore wafer miscuts around this orientation that produced the highest quantum efficiency LEDs. At the end of this program we had hoped to have MQWs active regions at 540 nm with an IQE of 50% and an EQE of 40%, which would be approximately twice the estimated current state-of-the-art.

  6. Eliminating stacking faults in semi-polar GaN by AlN interlayers

    SciTech Connect

    Dadgar, A.; Ravash, R.; Veit, P.; Schmidt, G.; Mueller, M.; Dempewolf, A.; Bertram, F.; Wieneke, M.; Christen, J.; Krost, A.

    2011-07-11

    We report on the elimination of stacking faults by the insertion of low-temperature AlN interlayers in nearly (1016) and (1104) oriented semi-polar GaN grown by metalorganic vapor phase epitaxy on Si(112) and Si(113), respectively. The elimination of these defects is visualized by cathodoluminescence (CL) as well as scanning transmission electron microscopy (STEM) and STEM-CL. A possible annihilation mechanism is discussed which leads to the conclusion that the elimination mechanism is most likely valid for all layers with (1101) surfaces, enabling heteroepitaxial semi- and non-polar GaN free from stacking faults.

  7. Optical investigation of microscopic defect distribution in semi-polar (1-101 and 11-22) InGaN light-emitting diodes

    NASA Astrophysics Data System (ADS)

    Hafiz, Shopan; Andrade, Nicolas; Monavarian, Morteza; Izyumskaya, Natalia; Das, Saikat; Zhang, Fan; Avrutin, Vitaliy; Morkoç, Hadis; Özgür, Ümit

    2016-02-01

    Near-field scanning optical microscopy was applied to investigate the spatial variations of extended defects and their effects on the optical quality for semi-polar (1-101) and (11-22) InGaN light emitting diodes (LEDs). (1-101) and (11-22) oriented InGaN LEDs emitting at 450-470 nm were grown on patterned Si (001) 7° offcut substrates and m-sapphire substrates by means of nano-epitaxial lateral overgrowth (ELO), respectively. For (1-101) structures, the photoluminescence (PL) at 85 K from the near surface c+ wings was found to be relatively uniform and strong across the sample. However, emission from the c- wings was substantially weaker due to the presence of high density of threading dislocations (TDs) and basal plane stacking faults (BSFs) as revealed from the local PL spectra. In case of (11-22) LED structures, near-field PL intensity correlated with the surface features and the striations along the direction parallel to the c-axis projection exposed facets where the Indium content was higher as deduced from shift in the PL peak energy.

  8. Topical Review: Development of overgrown semi-polar GaN for high efficiency green/yellow emission

    NASA Astrophysics Data System (ADS)

    Wang, T.

    2016-09-01

    The most successful example of large lattice-mismatched epitaxial growth of semiconductors is the growth of III-nitrides on sapphire, leading to the award of the Nobel Prize in 2014 and great success in developing InGaN-based blue emitters. However, the majority of achievements in the field of III-nitride optoelectronics are mainly limited to polar GaN grown on c-plane (0001) sapphire. This polar orientation poses a number of fundamental issues, such as reduced quantum efficiency, efficiency droop, green and yellow gap in wavelength coverage, etc. To date, it is still a great challenge to develop longer wavelength devices such as green and yellow emitters. One clear way forward would be to grow III-nitride device structures along a semi-/non-polar direction, in particular, a semi-polar orientation, which potentially leads to both enhanced indium incorporation into GaN and reduced quantum confined Stark effects. This review presents recent progress on developing semi-polar GaN overgrowth technologies on sapphire or Si substrates, the two kinds of major substrates which are cost-effective and thus industry-compatible, and also demonstrates the latest achievements on electrically injected InGaN emitters with long emission wavelengths up to and including amber on overgrown semi-polar GaN. Finally, this review presents a summary and outlook on further developments for semi-polar GaN based optoelectronics.

  9. Semipolar (202{sup ¯}1) GaN and InGaN quantum wells on sapphire substrates

    SciTech Connect

    Leung, Benjamin; Wang, Dili; Kuo, Yu-Sheng; Xiong, Kanglin; Song, Jie; Chen, Danti; Park, Sung Hyun; Han, Jung; Hong, Su Yeon; Choi, Joo Won

    2014-06-30

    Here, we demonstrate a process to produce planar semipolar (202{sup ¯}1) GaN templates on sapphire substrates. We obtain (202{sup ¯}1) oriented GaN by inclined c-plane sidewall growth from etched sapphire, resulting in single crystal material with on-axis x-ray diffraction linewidth below 200 arc sec. The surface, composed of (101{sup ¯}1) and (101{sup ¯}0) facets, is planarized by the chemical-mechanical polishing of full 2 in. wafers, with a final surface root mean square roughness of <0.5 nm. We then analyze facet formation and roughening mechanisms on the (202{sup ¯}1) surface and establish a growth condition in N{sub 2} carrier gas to maintain a planar surface for further device layer growth. Finally, the capability of these semipolar (202{sup ¯}1) GaN templates to produce high quality device structures is verified by the growth and characterization of InGaN/GaN multiple quantum well structures. It is expected that the methods shown here can enable the benefits of using semipolar orientations in a scalable and practical process and can be readily extended to achieve devices on surfaces using any orientation of semipolar GaN on sapphire.

  10. Polarity of semipolar wurtzite crystals: X-ray photoelectron diffraction from GaN(101⁻1) and GaN(202⁻1) surfaces

    SciTech Connect

    Romanyuk, O. Jiříček, P.; Bartoš, I.; Paskova, T.

    2014-09-14

    Polarity of semipolar GaN(101⁻1) (101⁻1⁻) and GaN(202⁻1) (202⁻1⁻) surfaces was determined with X-ray photoelectron diffraction (XPD) using a standard MgKα source. The photoelectron emission from N 1s core level measured in the a-plane of the crystals shows significant differences for the two crystal orientations within the polar angle range of 80–100° from the (0001) normal. It was demonstrated that XPD polar plots recorded in the a-plane are similar for each polarity of the GaN(101⁻1) and GaN(202⁻1) crystals if referred to (0001) crystal axes. For polarity determinations of all important GaN(h0h⁻l) semipolar surfaces, the above given polar angle range is suitable.

  11. Low defect large area semi-polar (112) GaN grown on patterned (113) silicon

    PubMed Central

    Pristovsek, Markus; Han, Yisong; Zhu, Tongtong; Frentrup, Martin; Kappers, Menno J; Humphreys, Colin J; Kozlowski, Grzegorz; Maaskant, Pleun; Corbett, Brian

    2015-01-01

    We report on the growth of semi-polar GaN (112) templates on patterned Si (113) substrates. Trenches were etched in Si (113) using KOH to expose Si {111} sidewalls. Subsequently an AlN layer to prevent meltback etching, an AlGaN layer for stress management, and finally two GaN layers were deposited. Total thicknesses up to 5 m were realised without cracks in the layer. Transmission electron microscopy showed that most dislocations propagate along [0001] direction and hence can be covered by overgrowth from the next trench. The defect densities were below and stacking fault densities less than 100 cm . These numbers are similar to reports on patterned r-plane sapphire. Typical X-ray full width at half maximum (FHWM) were 500” for the asymmetric (00.6) and 450” for the (11.2) reflection. These FHWMs were 50 % broader than reported for patterned r-plane sapphire which is attributed to different defect structures and total thicknesses. The surface roughness shows strong variation on templates. For the final surface roughness the roughness of the sidewalls of the GaN ridges at the time of coalescence are critical. PMID:26212392

  12. Filtering of Defects in Semipolar (11−22) GaN Using 2-Steps Lateral Epitaxial Overgrowth

    PubMed Central

    2010-01-01

    Good-quality (11−22) semipolar GaN sample was obtained using epitaxial lateral overgrowth. The growth conditions were chosen to enhance the growth rate along the [0001] inclined direction. Thus, the coalescence boundaries stop the propagation of basal stacking faults. The faults filtering and the improvement of the crystalline quality were attested by transmission electron microscopy and low temperature photoluminescence. The temperature dependence of the luminescence polarization under normal incidence was also studied. PMID:21170140

  13. Study of epitaxial lateral overgrowth of semipolar (1 1 − 2 2) GaN by using different SiO{sub 2} pattern sizes

    SciTech Connect

    Song, Ki-Ryong; Lee, Jae-Hwan; Han, Sang-Hyun; Yi, Hye-Rin; Lee, Sung-Nam

    2013-12-15

    Graphical abstract: - Highlights: • We examine comparative studies of semipolar ELO-GaN film. • Semipolar ELO-GaN film was grown by three step growth method. • The achievement of smooth surface morphology of semipolar ELO-GaN. • The crystal and optical properties was significantly improved by ELO process. - Abstract: We investigated the growth mode and the crystal properties of lateral epitaxial overgrowth (LEO) semipolar (1 1 − 2 2) GaN by using the various SiO{sub 2} pattern sizes of 6, 8, 10 and 12 μm with the window width of 4.0 μm. By using three-step growth technique, we successfully obtained the fully-coalescenced semipolar (1 1 − 2 2) LEO-GaN films regardless of the SiO{sub 2} pattern sizes. However, the coalescence thickness of LEO-GaN film was decreased with decreasing SiO{sub 2} pattern size, indicating that the coalescence of semipolar (1 1 − 2 2) GaN was easily formed by decreasing the pattern size of SiO{sub 2} mask. The full width at half maximums (FWHMs) of X-ray rocking curves (XRCs) of LEO-GaN films decreased with increasing SiO{sub 2} pattern size. In the pattern size of 4 × 10 μm, we achieved the minimum XRCs FWHM of 537 and 368 arc s with two different X-ray incident beam directions of [1 1 − 2 − 3] and [1 − 1 0 0], respectively. Moreover, the photoluminescence bandedge emission of semipolar (1 1 − 2 2) GaN was 45 times increased by LEO process. Based on these results, we concluded that the LEO pattern size of 4 × 10 μm would effectively decrease crystal defects of semipolar (1 1 − 2 2) GaN epilayer, resulting in an improvement of the optical properties.

  14. Improvement of optical quality of semipolar (11 2 ¯ 2 ) GaN on m-plane sapphire by in-situ epitaxial lateral overgrowth

    NASA Astrophysics Data System (ADS)

    Monavarian, Morteza; Izyumskaya, Natalia; Müller, Marcus; Metzner, Sebastian; Veit, Peter; Can, Nuri; Das, Saikat; Özgür, Ümit; Bertram, Frank; Christen, Jürgen; Morkoç, Hadis; Avrutin, Vitaliy

    2016-04-01

    Among the major obstacles for development of non-polar and semipolar GaN structures on foreign substrates are stacking faults which deteriorate the structural and optical quality of the material. In this work, an in-situ SiNx nano-network has been employed to achieve high quality heteroepitaxial semipolar (11 2 ¯ 2 ) GaN on m-plane sapphire with reduced stacking fault density. This approach involves in-situ deposition of a porous SiNx interlayer on GaN that serves as a nano-mask for the subsequent growth, which starts in the nanometer-sized pores (window regions) and then progresses laterally as well, as in the case of conventional epitaxial lateral overgrowth (ELO). The inserted SiNx nano-mask effectively prevents the propagation of defects, such as dislocations and stacking faults, in the growth direction and thus reduces their density in the overgrown layers. The resulting semipolar (11 2 ¯ 2 ) GaN layers exhibit relatively smooth surface morphology and improved optical properties (PL intensity enhanced by a factor of 5 and carrier lifetimes by 35% to 85% compared to the reference semipolar (11 2 ¯ 2 ) GaN layer) which approach to those of the c-plane in-situ nano-ELO GaN reference and, therefore, holds promise for light emitting and detecting devices.

  15. Morphology and strain of self-assembled semipolar GaN quantum dots in (1122) AlN

    SciTech Connect

    Dimitrakopulos, G. P.; Kalesaki, E.; Kioseoglou, J.; Kehagias, Th.; Lotsari, A.; Komninou, Ph.; Karakostas, Th.; Lahourcade, L.; Monroy, E.; Jurczak, G.; Young, T. D.; Dluzewski, P.

    2010-11-15

    GaN quantum dots (QDs) grown in semipolar (1122) AlN by plasma-assisted molecular-beam epitaxy were studied by transmission electron microscopy (TEM) and scanning transmission electron microscopy techniques. The embedded (1122)-grown QDs exhibited pyramidal or truncated-pyramidal morphology consistent with the symmetry of the nucleating plane, and were delimited by nonpolar and semipolar nanofacets. It was also found that, in addition to the (1122) surface, QDs nucleated at depressions comprising (1011) facets. This was justified by ab initio density functional theory calculations showing that such GaN/AlN facets are of lower energy compared to (1122). Based on quantitative high-resolution TEM strain measurements, the three-dimensional QD strain state was analyzed using finite-element simulations. The internal electrostatic field was then estimated, showing small potential drop along the growth direction, and limited localization at most QD interfaces.

  16. Anisotropic structural and optical properties of semi-polar (11–22) GaN grown on m-plane sapphire using double AlN buffer layers

    PubMed Central

    Zhao, Guijuan; Wang, Lianshan; Yang, Shaoyan; Li, Huijie; Wei, Hongyuan; Han, Dongyue; Wang, Zhanguo

    2016-01-01

    We report the anisotropic structural and optical properties of semi-polar (11–22) GaN grown on m-plane sapphire using a three-step growth method which consisted of a low temperature AlN buffer layer, followed by a high temperature AlN buffer layer and GaN growth. By introducing double AlN buffer layers, we substantially improve the crystal and optical qualities of semi-polar (11–22) GaN, and significantly reduce the density of stacking faults and dislocations. The high resolution x-ray diffraction measurement revealed that the in-plane anisotropic structural characteristics of GaN layer are azimuthal dependent. Transmission electron microscopy analysis showed that the majority of dislocations in the GaN epitaxial layer grown on m-sapphire are the mixed-type and the orientation of GaN layer was rotated 58.4° against the substrate. The room temperature photoluminescence (PL) spectra showed the PL intensity and wavelength have polarization dependence along parallel and perpendicular to the [1–100] axis (polarization degrees ~ 0.63). The realization of a high polarization semi-polar GaN would be useful to achieve III-nitride based lighting emission device for displays and backlighting. PMID:26861595

  17. Compositionally graded relaxed AlGaN buffers on semipolar GaN for mid-ultraviolet emission

    SciTech Connect

    Young, Erin C.; Wu Feng; Haeger, Daniel A.; Nakamura, Shuji; Denbaars, Steven P.; Cohen, Daniel A.; Speck, James S.; Romanov, Alexey E.

    2012-10-01

    In this Letter, we report on the growth and properties of relaxed, compositionally graded Al{sub x}Ga{sub 1-x}N buffer layers on freestanding semipolar (2021) GaN substrates. Continuous and step compositional grades with Al concentrations up to x = 0.61 have been achieved, with emission wavelengths in the mid-ultraviolet region as low as 265 nm. Coherency stresses were relaxed progressively throughout the grades by misfit dislocation generation via primary (basal) slip and secondary (non-basal) slip systems. Threading dislocation densities in the final layers of the grades were less than 10{sup 6}/cm{sup 2} as confirmed by plan-view transmission electron microscopy and cathodoluminescence studies.

  18. Electron tomography of (In,Ga)N insertions in GaN nanocolumns grown on semi-polar (112{sup -}2) GaN templates

    SciTech Connect

    Niehle, M. Trampert, A.; Albert, S.; Bengoechea-Encabo, A.; Calleja, E.

    2015-03-01

    We present results of scanning transmission electron tomography on GaN/(In,Ga)N/GaN nanocolumns (NCs) that grew uniformly inclined towards the patterned, semi-polar GaN(112{sup -}2) substrate surface by molecular beam epitaxy. For the practical realization of the tomographic experiment, the nanocolumn axis has been aligned parallel to the rotation axis of the electron microscope goniometer. The tomographic reconstruction allows for the determination of the three-dimensional indium distribution inside the nanocolumns. This distribution is strongly interrelated with the nanocolumn morphology and faceting. The (In,Ga)N layer thickness and the indium concentration differ between crystallographically equivalent and non-equivalent facets. The largest thickness and the highest indium concentration are found at the nanocolumn apex parallel to the basal planes.

  19. Indium and impurity incorporation in InGaN films on polar, nonpolar, and semipolar GaN orientations grown by ammonia molecular beam epitaxy

    SciTech Connect

    Browne, David A.; Young, Erin C.; Lang, Jordan R.; Hurni, Christophe A.; Speck, James S.

    2012-07-15

    The effects of NH{sub 3} flow, group III flux, and substrate growth temperature on indium incorporation and surface morphology have been investigated for bulk InGaN films grown by ammonia molecular beam epitaxy. The incorporation of unintentional impurity elements (H, C, O) in InGaN films was studied as a function of growth temperature for growth on polar (0001) GaN on sapphire templates, nonpolar (1010) bulk GaN, and semipolar (1122), (2021) bulk GaN substrates. Enhanced indium incorporation was observed on both (1010) and (2021) surfaces relative to c-plane, while reduced indium incorporation was observed on (1122) for co-loaded conditions. Indium incorporation was observed to increase with decreasing growth temperature for all planes, while being relatively unaffected by the group III flux rates for a 1:1 Ga:In ratio. Indium incorporation was found to increase at the expense of a decreased growth rate for higher ammonia flows; however, smooth surface morphology was consistently observed for growth on semipolar orientations. Increased concentrations of oxygen and hydrogen were observed on semipolar and nonpolar orientations with a clear trend of increased hydrogen incorporation with indium content.

  20. Efficient reduction of defects in (1120) non-polar and (1122) semi-polar GaN grown on nanorod templates

    NASA Astrophysics Data System (ADS)

    Bai, J.; Gong, Y.; Xing, K.; Yu, X.; Wang, T.

    2013-03-01

    (1120) non-polar and (1122) semi-polar GaNs with a low defect density have been achieved by means of an overgrowth on nanorod templates, where a quick coalescence with a thickness even below 1 μm occurs. On-axis and off-axis X-ray rocking curve measurements have shown a massive reduction in the linewidth for our overgrown GaN in comparison with standard GaN films grown on sapphire substrates. Transmission electron microscope observation demonstrates that the overgrowth on the nanorod templates takes advantage of an omni-directional growth around the sidewalls of the nanostructures. The dislocations redirect in basal planes during the overgrowth, leading to their annihilation and termination at voids formed due to a large lateral growth rate. In the non-polar GaN, the priority <0001> lateral growth from vertical sidewalls of nanorods allows basal plane stacking faults (BSFs) to be blocked in the nanorod gaps; while for semi-polar GaN, the propagation of BSFs starts to be impeded when the growth front is changed to be along inclined <0001> direction above the nanorods.

  1. Efficient reduction of defects in (1120) non-polar and (1122) semi-polar GaN grown on nanorod templates

    SciTech Connect

    Bai, J.; Gong, Y.; Xing, K.; Yu, X.; Wang, T.

    2013-03-11

    (1120) non-polar and (1122) semi-polar GaNs with a low defect density have been achieved by means of an overgrowth on nanorod templates, where a quick coalescence with a thickness even below 1 {mu}m occurs. On-axis and off-axis X-ray rocking curve measurements have shown a massive reduction in the linewidth for our overgrown GaN in comparison with standard GaN films grown on sapphire substrates. Transmission electron microscope observation demonstrates that the overgrowth on the nanorod templates takes advantage of an omni-directional growth around the sidewalls of the nanostructures. The dislocations redirect in basal planes during the overgrowth, leading to their annihilation and termination at voids formed due to a large lateral growth rate. In the non-polar GaN, the priority <0001> lateral growth from vertical sidewalls of nanorods allows basal plane stacking faults (BSFs) to be blocked in the nanorod gaps; while for semi-polar GaN, the propagation of BSFs starts to be impeded when the growth front is changed to be along inclined <0001> direction above the nanorods.

  2. Epitaxial lateral overgrowth of (112xAF2) semipolar GaN on (11xAF00) m-plane sapphire by metalorganic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Ni, X.; Özgür, Ü.; Baski, A. A.; Morkoç, H.; Zhou, Lin; Smith, David J.; Tran, C. A.

    2007-04-01

    The authors report the growth of semipolar (112¯2) GaN films on nominally on-axis (101¯0) m-plane sapphire substrates using metal organic chemical vapor deposition. High-resolution x-ray diffraction (XRD) results indicate a preferred (112¯2) GaN orientation. Moreover, epitaxial lateral overgrowth (ELO) of GaN was carried out on the (112¯2) oriented GaN templates. When the ELO stripes were aligned along [11accent="true">2¯0]sapphire, the Ga-polar wings were inclined by 32° with respect to the substrate plane with smooth extended nonpolar a-plane GaN surfaces and polar c-plane GaN growth fronts. When compared with the template, the on-axis and off-axis XRD rocking curves indicated significant improvement in the crystalline quality by ELO for this mask orientation (on-axis 1700arcsec for the template, 380arcsec for the ELO sample, when rocked toward the GaN m axis), as verified by transmission electron microscopy (TEM). For growth mask stripes aligned along [0001]sapphire with GaN m-plane as growth fronts, the surface was composed of two {101¯1} planes making a 26° angle with the substrate plane. For this mask orientation XRD and TEM showed no improvement in the crystalline quality by ELO when compared to the non-ELO template.

  3. Optical studies of strain and defect distribution in semipolar (11xAF01) GaN on patterned Si substrates

    NASA Astrophysics Data System (ADS)

    Izyumskaya, N.; Zhang, F.; Okur, S.; Selden, T.; Avrutin, V.; Özgür, Ü.; Metzner, S.; Karbaum, C.; Bertram, F.; Christen, J.; Morkoç, H.

    2013-09-01

    Formation of defects in semipolar (11¯01)-oriented GaN layers grown by metal-organic chemical vapor deposition on patterned Si (001) substrates and their effects on optical properties were investigated by steady-state and time-resolved photoluminescence (PL) and spectrally and spatially resolved cathodoluminescence (CL). Near-band edge emission is found to be dominant in the c+-wings of semipolar (11¯01)GaN, which are mainly free from defect-related emission lines, while the c- wings contain a large number of basal stacking faults. When the advancing c+ and c— fronts meet to coalesce into a continuous film, the existing stacking faults contained in c— wings continue to propagate in the direction perpendicular to the c-axis and, as a result, the region dominated by stacking fault emission is extended to the film surface. Additional stacking faults are observed within the c+ wings, where the growing c+ wings of GaN are in contact with the SiO2 masking layer. Out-diffusion of oxygen/silicon species and concentration of strain near the contact region are considered as possible causes of the stacking fault formation. CL linescans performed along the surface and across the thickness of the non-coalesced and coalesced layers revealed that, while most of the material in the near-surface region of the non-coalesced layers is relaxed, coalescence results in nonuniform strain distribution over the layer surface. Red-shifted near-band-edge emission from the near-surface region indicates tensile stress near the surface of a coalesced layer, reaching a value of 0.3 GPa. The regions near the GaN/AlN/Si(111) interface show slightly blue shifted, broadened near-band-edge emission, which is indicative of a high concentration of free carriers possibly due to incorporation of shallow-donor impurities (Si and/or O) from the substrate or SiO2 mask. Steady-state and time-resolved PL results indicate that semipolar (11¯01)GaN on patterned Si exhibits optical properties (PL

  4. High-power blue laser diodes with indium tin oxide cladding on semipolar (202{sup ¯}1{sup ¯}) GaN substrates

    SciTech Connect

    Pourhashemi, A. Farrell, R. M.; Cohen, D. A.; Speck, J. S.; DenBaars, S. P.; Nakamura, S.

    2015-03-16

    We demonstrate a high power blue laser diode (LD) using indium tin oxide as a cladding layer on semipolar oriented GaN. These devices show peak output powers and external quantum efficiencies comparable to state-of-the-art commercial c-plane devices. Ridge waveguide LDs were fabricated on (202{sup ¯}1{sup ¯}) oriented GaN substrates using InGaN waveguiding layers and GaN cladding layers. At a lasing wavelength of 451 nm at room temperature, an output power of 2.52 W and an external quantum efficiency of 39% were measured from a single facet under a pulsed injection current of 2.34 A. The measured differential quantum efficiency was 50%.

  5. Optical properties of small GaN-Al0.5Ga0.5N quantum dots grown on (11-22) GaN templates

    NASA Astrophysics Data System (ADS)

    Sellés, Julien; Rosales, Daniel; Gil, Bernard; Cassabois, Guillaume; Guillet, Thierry; Brault, Julien; Damilano, Benjamin; Vennéguès, Philippe; de Mierry, Philippe; Massies, Jean

    2015-03-01

    GaN/Al0.5Ga0.5N quantum dots deposited on the (11-22) plane have been grown by combining Molecular Beam Epitaxy (MBE) and Metal Organic Vapor Phase Epitaxy (MOVPE). The (11-22) GaN oriented template was realized by MOVPE starting from a M-plane oriented sapphire substrate. The average dot sizes are the following: between 15 and 20 nm in the <-1-123> and <1-100> directions and a height ranging between 0.8 and 1.4 nm. Their density is ranging between 2 and 8x1010cm-2. The crystal field splitting is measured in Al0.5Ga0.5N via polarized microphotoluminescence. We study the photoluminescence properties of small quantum dots which present innovative optical properties among which are the evolution of the polarization of the emitted photons at different temperatures. We also analyze the distortion of the photoluminescence at different time delays after the excitation pulse. A redshift is found that is attributed to the complex thermally-induced delocalization of the carriers through the assembly of dots from the smaller ones to the bigger ones.

  6. Selective area growth and characterization of GaN nanocolumns, with and without an InGaN insertion, on semi-polar (11–22) GaN templates

    SciTech Connect

    Bengoechea-Encabo, A.; Albert, S.; Barbagini, F.; Sanchez-Garcia, M. A.; Calleja, E.; Trampert, A.

    2013-12-09

    The aim of this work is the selective area growth (SAG) of GaN nanocolumns, with and without an InGaN insertion, by molecular beam epitaxyon semi-polar (11–22) GaN templates. The high density of stacking faults present in the template is strongly reduced after SAG. A dominant sharp photoluminescence emission at 3.473 eV points to high quality strain-free material. When embedding an InGaN insertion into the ordered GaN nanostructures, very homogeneous optical properties are observed, with two emissions originating from different regions of each nanostructure, most likely related to different In contents on different crystallographic planes.

  7. Spectroscopic study of semipolar (112{sup ¯}2)-HVPE GaN exhibiting high oxygen incorporation

    SciTech Connect

    Schustek, Philipp; Hocker, Matthias; Thonke, Klaus; Klein, Martin; Scholz, Ferdinand; Simon, Ulrich

    2014-10-28

    Spatially resolved luminescence and Raman spectroscopy investigations are applied to a series of (112{sup ¯}2)-GaN samples grown by hydride vapor phase epitaxy (HVPE) grown over an initial layer deposited by metal organic vapor phase epitaxy on patterned sapphire substrates. Whereas these two differently grown GaN layers are crystallographically homogeneous, they differ largely in their doping level due to high unintentional oxygen uptake in the HVPE layer. This high doping shows up in luminescence spectra, which can be explained by a free-electron recombination band for which an analytical model considering the Burstein-Moss shift, conduction band tailing, and the bandgap renormalization is included. Secondary ion mass spectrometry, Raman spectroscopy, and Hall measurements concordantly determine the electron density to be above 10{sup 19 }cm{sup −3}. In addition, the strain state is assessed by Raman spectroscopy and compared to a finite element analysis.

  8. Ab initio density functional theory study of non-polar (101{sup ¯}0), (112{sup ¯}0) and semipolar (202{sup ¯}1) GaN surfaces

    SciTech Connect

    Mutombo, P.; Romanyuk, O.

    2014-05-28

    The atomic structures of non-polar GaN(101{sup ¯}0), (112{sup ¯}0) and semipolar GaN(202{sup ¯}1), (202{sup ¯}1{sup ¯}) surfaces were studied using ab initio calculations within density functional theory. The bulk-like truncated (1 × 1) structure with buckled Ga-N or Ga-Ga dimers was found stable on the non-polar GaN(101{sup ¯}0) surface in agreement with previous works. Ga-N heterodimers were found energetically stable on the GaN(112{sup ¯}0)-(1 × 1) surface. The formation of vacancies and substitution site defects was found unfavorable for non-polar GaN surfaces. Semipolar GaN(202{sup ¯}1)-(1 × 1) surface unit cells consist of non-polar (101{sup ¯}0) and semipolar (101{sup ¯}1) nano-facets. The (101{sup ¯}1) nano-facets consist of two-fold coordinated atoms, which form N-N dimers within a (2 × 1) surface unit cell on a GaN(202{sup ¯}1) surface. Dimers are not formed on the GaN(202{sup ¯}1{sup ¯}) surface. The stability of the surfaces with single (101{sup ¯}0) or (101{sup ¯}1) nano-facets was analyzed. A single non-polar (101{sup ¯}0)-(1 × 1) nano-facet was found stable on the GaN(202{sup ¯}1) surface, but unstable on the GaN(202{sup ¯}1{sup ¯}) surface. A single (101{sup ¯}1) nano-facet was found unstable. Semipolar GaN surfaces with (202{sup ¯}1) and (202{sup ¯}1{sup ¯}) polarity can be stabilized with a Ga overlayer at Ga-rich experimental conditions.

  9. Blue, Green, and Amber InGaN/GaN Light-Emitting Diodes on Semipolar {11\\bar{2}2} GaN Bulk Substrates

    NASA Astrophysics Data System (ADS)

    Funato, Mitsuru; Ueda, Masaya; Kawakami, Yoichi; Narukawa, Yukio; Kosugi, Takao; Takahashi, Masayoshi; Mukai, Takashi

    2006-07-01

    We demonstrate the fabrication of blue, green, and amber InGaN/GaN light-emitting diodes (LEDs) on semipolar {11\\bar{2}2} bulk GaN substrates. The {11\\bar{2}2}GaN substrates used in this study are produced by cutting out from a c-oriented GaN bulk crystal grown by hydride vapor epitaxy. The LEDs have a dimension of 320 × 320 μm2 and are packed in an epoxide resin. The output power and external quantum efficiency (EQE) at a driving current of 20 mA are 1.76 mW and 3.0%, respectively, for the blue LED, 1.91 mW and 4.1% for the green LED, and 0.54 mW and 1.3% for the amber LED. The maximum output powers obtained with a maximum current of 200 mA are 19.0 mW (blue), 13.4 mW (green), and 1.9 mW (amber), while the maximum EQEs are 4.0% at 140 mA (blue), 4.9% at 0.2 mA (green), and 1.6% at 1 mA (amber). It is confirmed that the emission light is polarized along the [1\\bar{1}00] direction, reflecting the low crystal symmetry of the {11\\bar{2}2} plane.

  10. Optical properties of yellow light-emitting diodes grown on semipolar (112xAF2) bulk GaN substrates

    NASA Astrophysics Data System (ADS)

    Sato, Hitoshi; Chung, Roy B.; Hirasawa, Hirohiko; Fellows, Natalie; Masui, Hisashi; Wu, Feng; Saito, Makoto; Fujito, Kenji; Speck, James S.; DenBaars, Steven P.; Nakamura, Shuji

    2008-06-01

    We demonstrate high power yellow InGaN single-quantum-well light-emitting diodes (LEDs) with a peak emission wavelength of 562.7nm grown on low extended defect density semipolar (112¯2) bulk GaN substrates by metal organic chemical vapor deposition. The output power and external quantum efficiency at drive currents of 20 and 200mA under pulsed operation (10% duty cycle) were 5.9mW, 13.4% and 29.2mW, 6.4%, respectively. It was observed that the temperature dependence of the output power of InGaN LEDs was significantly smaller than that of AlInGaP LEDs.

  11. Chemically assisted ion beam etching of laser diode facets on nonpolar and semipolar orientations of GaN

    NASA Astrophysics Data System (ADS)

    Kuritzky, L. Y.; Becerra, D. L.; Saud Abbas, A.; Nedy, J.; Nakamura, S.; DenBaars, S. P.; Cohen, D. A.

    2016-07-01

    We demonstrate a vertical (<1° departure) and smooth (2.0 nm root mean square line-edge roughness (LER)) etch by chemically assisted Ar ion beam etching (CAIBE) in Cl2 chemistry that is suitable for forming laser diode (LD) facets on nonpolar and semipolar oriented III-nitride devices. The etch profiles were achieved with photoresist masks and optimized CAIBE chamber conditions including the platen tilt angle and Cl2 flow rate. Co-loaded studies showed similar etch rates of ∼60 nm min‑1 for (20\\bar{2}\\bar{1}),(20\\bar{2}1), and m-plane orientations. The etched surfaces of LD facets on these orientations are chemically dissimilar (Ga-rich versus N-rich), but were visually indistinguishable, thus confirming the negligible orientation dependence of the etch. Continuous-wave blue LDs were fabricated on the semipolar (20\\bar{2}\\bar{1}) plane to compare CAIBE and reactive ion etch (RIE) facet processes. The CAIBE process resulted in LDs with lower threshold current densities due to reduced parasitic mirror loss compared with the RIE process. The LER, degree of verticality, and model of the 1D vertical laser mode were used to calculate a maximum uncoated facet reflection of 17% (94% of the nominal) for the CAIBE facet. The results demonstrate the suitability of CAIBE for forming high quality facets for high performance nonpolar and semipolar III-N LDs.

  12. Cathodoluminescence study of Mg activation in non-polar and semi-polar faces of undoped/Mg-doped GaN core-shell nanorods

    NASA Astrophysics Data System (ADS)

    Hortelano, V.; Martínez, O.; Cuscó, R.; Artús, L.; Jiménez, J.

    2016-03-01

    Spectrally and spatially resolved cathodoluminescence (CL) measurements were carried out at 80 K on undoped/Mg-doped GaN core-shell nanorods grown by selective area growth metalorganic vapor phase epitaxy in order to investigate locally the optical activity of the Mg dopants. A study of the luminescence emission distribution over the different regions of the nanorods is presented. We have investigated the CL fingerprints of the Mg incorporation into the non-polar lateral prismatic facets and the semi-polar facets of the pyramidal tips. The amount of Mg incorporation/activation was varied by using several Mg/Ga flow ratios and post-growth annealing treatment. For lower Mg/Ga flow ratios, the annealed nanorods clearly display a donor-acceptor pair band emission peaking at 3.26-3.27 eV and up to 4 LO phonon replicas, which can be considered as a reliable indicator of effective p-type Mg doping in the nanorod shell. For higher Mg/Ga flow ratios, a substantial enhancement of the yellow luminescence emission as well as several emission subbands are observed, which suggests an increase of disorder and the presence of defects as a consequence of the excess Mg doping.

  13. Impact of inhomogeneous broadening on optical polarization of high-inclination semipolar and nonpolar InxGa1 -xN /GaN quantum wells

    NASA Astrophysics Data System (ADS)

    Mounir, Christian; Schwarz, Ulrich T.; Koslow, Ingrid L.; Kneissl, Michael; Wernicke, Tim; Schimpke, Tilman; Strassburg, Martin

    2016-06-01

    We investigate the influence of inhomogeneous broadening on the optical polarization properties of high-inclination semipolar and nonpolar InxGa1 -xN /GaN quantum wells. Different planar m-plane and (20 2 ¯1 ¯) samples were grown (including core-shell microrods) and have been characterized by excitation-dependent polarization-resolved confocal micro-photoluminescence. The measured degree of linear polarization (DLP) is compared to theoretical predictions obtained by Fermi-Dirac statistical filling of the electronic band structure calculated by the k .p envelope function method. We show that our measured DLP at room temperature, as well as values reported by other groups, are systematically higher than the theoretical predictions. We propose to solve this discrepancy between theory and experiment by introducing inhomogeneous broadening in our calculations. Considering indium content fluctuations and the localization lengths of electrons and holes, different effective broadenings are applied to different subsets of subbands. We thereby show that inhomogeneous broadening leads to an increase of the DLP at room temperature. Furthermore, the dependence of the optical properties on the excitation density is better reproduced. Looking at the DLP as a function of the temperature gives us insight into the thermalization dynamics of charge carriers.

  14. Optical properties and structural investigations of (11-22)-oriented GaN/Al{sub 0.5}Ga{sub 0.5}N quantum wells grown by molecular beam epitaxy

    SciTech Connect

    Rosales, Daniel; Gil, Bernard; Bretagnon, Thierry; Brault, Julien; Vennéguès, Philippe; Nemoz, Maud; Mierry, Philippe de; Damilano, Benjamin; Massies, Jean; Bigenwald, Pierre

    2015-07-14

    We have grown (11-22)-oriented GaN/Al{sub 0.5}Ga{sub 0.5}N quantum wells (QWs) using molecular beam epitaxy on GaN (11-22)-oriented templates grown by metal-organic vapor phase epitaxy on m-plane oriented sapphire substrates. The performance of epitaxial growth of GaN/Al{sub 0.5}Ga{sub 0.5}N heterostructures on the semi-polar orientation (11-22) in terms of surface roughness and structural properties, i.e., strain relaxation mechanisms is discussed. In addition, high resolution transmission electron microscopy reveals very smooth QW interfaces. The photoluminescence of such samples are strictly originating from radiative recombination of free excitons for temperatures above 100 K. At high temperature, the population of localized excitons, moderately trapped (5 meV) at low temperature, is negligible.

  15. Optical properties and structural investigations of (11-22)-oriented GaN/Al0.5Ga0.5N quantum wells grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Rosales, Daniel; Gil, Bernard; Bretagnon, Thierry; Brault, Julien; Vennéguès, Philippe; Nemoz, Maud; de Mierry, Philippe; Damilano, Benjamin; Massies, Jean; Bigenwald, Pierre

    2015-07-01

    We have grown (11-22)-oriented GaN/Al0.5Ga0.5N quantum wells (QWs) using molecular beam epitaxy on GaN (11-22)-oriented templates grown by metal-organic vapor phase epitaxy on m-plane oriented sapphire substrates. The performance of epitaxial growth of GaN/Al0.5Ga0.5N heterostructures on the semi-polar orientation (11-22) in terms of surface roughness and structural properties, i.e., strain relaxation mechanisms is discussed. In addition, high resolution transmission electron microscopy reveals very smooth QW interfaces. The photoluminescence of such samples are strictly originating from radiative recombination of free excitons for temperatures above 100 K. At high temperature, the population of localized excitons, moderately trapped (5 meV) at low temperature, is negligible.

  16. Hydride vapor phase epitaxy of high quality {101¯3¯} semipolar GaN on m-plane sapphire coated with self-assembled SiO2 nanospheres

    NASA Astrophysics Data System (ADS)

    Yang, Jiankun; Wei, Tongbo; Huo, Ziqiang; Hu, Qiang; Zhang, Yonghui; Duan, Ruifei; Wang, Junxi

    2014-02-01

    Semipolar {101¯3¯} GaN layers were grown on self-assembled SiO2 nanospheres sapphire (SSNS) by hydride vapor phase epitaxy. The RMS roughness was 1.1 nm for the scan of 20×20 µm2 and the striated surface morphology almost disappeared. The full widths at half maximum of on-axis X-ray rocking curves were 324 arcsec rocking toward the [303¯2¯] direction and 413 arcsec rocking toward the [12¯10] direction, respectively. Compared to the GaN layer grown on the planar sapphire, the reduction of the defect density of semi-GaN grown on SSNS, such as basal stacking faults, partial dislocations and perfect dislocations, was demonstrated by both X-ray rocking curves and low-temperature photoluminescence. In addition, the Raman analyses also showed the partial relaxation of the stress using SSNS.

  17. A method used to overcome polarization effects in semi-polar structures of nitride light-emitting diodes emitting green radiation

    NASA Astrophysics Data System (ADS)

    Morawiec, Seweryn; Sarzała, Robert P.; Nakwaski, Włodzimierz

    2013-11-01

    Polarization effects are studied within nitride light-emitting diodes (LEDs) manufactured on standard polar and semipolar substrates. A new theoretical approach, somewhat different than standard ones, is proposed to this end. It is well known that when regular polar GaN substrates are used, strong piezoelectric and spontaneous polarizations create built-in electric fields leading to the quantum-confined Stark effects (QCSEs). These effects may be completely avoided in nonpolar crystallographic orientations, but then there are problems with manufacturing InGaN layers of relatively high Indium contents necessary for the green emission. Hence, a procedure leading to partly overcoming these polarization problems in semi-polar LEDs emitting green radiation is proposed. The (11 22) crystallographic substrate orientation (inclination angle of 58∘ to c plane) seems to be the most promising because it is characterized by low Miller-Bravais indices leading to high-quality and high Indium content smooth growth planes. Besides, it makes possible an increased Indium incorporation efficiency and it is efficient in suppressing QCSE. The In0.3Ga0.7N/GaN QW LED grown on the semipolar (11 22) substrate has been found as currently the optimal LED structure emitting green radiation.

  18. EDITORIAL: Non-polar and semipolar nitride semiconductors Non-polar and semipolar nitride semiconductors

    NASA Astrophysics Data System (ADS)

    Han, Jung; Kneissl, Michael

    2012-02-01

    Throughout the history of group-III-nitride materials and devices, scientific breakthroughs and technological advances have gone hand-in-hand. In the late 1980s and early 1990s, the discovery of the nucleation of smooth (0001) GaN films on c-plane sapphire and the activation of p-dopants in GaN led very quickly to the realization of high-brightness blue and green LEDs, followed by the first demonstration of GaN-based violet laser diodes in the mid 1990s. Today, blue InGaN LEDs boast record external quantum efficiencies exceeding 80% and the emission wavelength of the InGaN-based laser diode has been pushed into the green spectral range. Although these tremenduous advances have already spurred multi-billion dollar industries, there are still a number of scientific questions and technological issues that are unanswered. One key challenge is related to the polar nature of the III-nitride wurtzite crystal. Until a decade ago all research activities had almost exclusively concentrated on (0001)-oriented polar GaN layers and heterostructures. Although the device characteristics seem excellent, the strong polarization fields at GaN heterointerfaces can lead to a significant deterioration of the device performance. Triggered by the first demonstration non-polar GaN quantum wells grown on LiAlO2 by Waltereit and colleagues in 2000, impressive advances in the area of non-polar and semipolar nitride semiconductors and devices have been achieved. Today, a large variety of heterostructures free of polarization fields and exhibiting exceptional electronic and optical properties have been demonstrated, and the fundamental understanding of polar, semipolar and non-polar nitrides has made significant leaps forward. The contributions in this Semiconductor Science and Technology special issue on non-polar and semipolar nitride semiconductors provide an impressive and up-to-date cross-section of all areas of research and device physics in this field. The articles cover a wide range of

  19. U.S. Department of Energy, National Energy Technology Laboratory Solid-State Lighting Core Technologies Light Emitting Diodes on Semipolar Bulk GaN Substrate with IQE > 80% at 150 A/cm2 and 100 0C

    SciTech Connect

    Chakraborty, Arpan; David, Aurelien; Grundmann, Michael; Tyagi, Anurag; Craven, Michael; Hurni, Christophe; Cich, Michael

    2015-03-31

    GaN is a crucial material for light-emitting diodes (LEDs) emitting in the violet-to-green range. Despite its good performance, it still suffers from significant technical limitations. In particular, the efficiency of GaN-based LEDs decreases at high current (“current droop”) and high temperature (“temperature droop”). This is problematic in some lighting applications, where a high-power operation is required. This program studied the use of particular substrates to improve the efficiency of GaN-based LEDs: bulk semipolar (SP) GaN substrates. These substrates possess a very high material quality, and physical properties which are distinctly different from legacy substrates currently used in the LED industry. The program focused on the development of accurate metrology to quantify the performance of GaN-based LEDs, and on improvement to LED quality and design on SP substrates. Through a thorough optimization process, we demonstrated violet LEDs with very high internal quantum efficiency, exceeding 85% at high temperature and high current. We also investigated longer-wavelength blue emitters, but found that the limited strain budget was a key limitation.

  20. EDITORIAL: Non-polar and semipolar nitride semiconductors Non-polar and semipolar nitride semiconductors

    NASA Astrophysics Data System (ADS)

    Han, Jung; Kneissl, Michael

    2012-02-01

    Throughout the history of group-III-nitride materials and devices, scientific breakthroughs and technological advances have gone hand-in-hand. In the late 1980s and early 1990s, the discovery of the nucleation of smooth (0001) GaN films on c-plane sapphire and the activation of p-dopants in GaN led very quickly to the realization of high-brightness blue and green LEDs, followed by the first demonstration of GaN-based violet laser diodes in the mid 1990s. Today, blue InGaN LEDs boast record external quantum efficiencies exceeding 80% and the emission wavelength of the InGaN-based laser diode has been pushed into the green spectral range. Although these tremenduous advances have already spurred multi-billion dollar industries, there are still a number of scientific questions and technological issues that are unanswered. One key challenge is related to the polar nature of the III-nitride wurtzite crystal. Until a decade ago all research activities had almost exclusively concentrated on (0001)-oriented polar GaN layers and heterostructures. Although the device characteristics seem excellent, the strong polarization fields at GaN heterointerfaces can lead to a significant deterioration of the device performance. Triggered by the first demonstration non-polar GaN quantum wells grown on LiAlO2 by Waltereit and colleagues in 2000, impressive advances in the area of non-polar and semipolar nitride semiconductors and devices have been achieved. Today, a large variety of heterostructures free of polarization fields and exhibiting exceptional electronic and optical properties have been demonstrated, and the fundamental understanding of polar, semipolar and non-polar nitrides has made significant leaps forward. The contributions in this Semiconductor Science and Technology special issue on non-polar and semipolar nitride semiconductors provide an impressive and up-to-date cross-section of all areas of research and device physics in this field. The articles cover a wide range of

  1. Waveguide Optimization for Semipolar (In,Al,Ga)N Lasers

    NASA Astrophysics Data System (ADS)

    Rass, Jens; Ploch, Simon; Wernicke, Tim; Frentrup, Martin; Weyers, Markus; Kneissl, Michael

    2013-08-01

    In this work the optical waveguiding in semipolar InGaN-based laser diodes is analyzed. Different designs of the separate confinement heterostructure with AlGaN or GaN cladding layers and GaN or InGaN waveguide layers are studied. The influence of waveguide material, thickness and composition on the optical confinement factor Γ, the accumulated strain energy E and the refractive index contrast is calculated. Measurements of the threshold and the far field intensity distributions of lasers with differing waveguide design confirm the predictions from model calculations. The optimum waveguide for a 410 nm single quantum well laser is found to consist of a symmetric In0.04Ga0.96N waveguide of 2×85 nm thickness with GaN cladding layers.

  2. 27 CFR 11.22 - Consignment sales.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 27 Alcohol, Tobacco Products and Firearms 1 2010-04-01 2010-04-01 false Consignment sales. 11.22... OF THE TREASURY LIQUORS CONSIGNMENT SALES Unlawful Sales Arrangements § 11.22 Consignment sales. Consignment sales are arrangements wherein the trade buyer is under no obligation to pay for distilled...

  3. 37 CFR 11.22 - Investigations.

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... 37 Patents, Trademarks, and Copyrights 1 2010-07-01 2010-07-01 false Investigations. 11.22 Section... COMMERCE REPRESENTATION OF OTHERS BEFORE THE UNITED STATES PATENT AND TRADEMARK OFFICE Investigations and Disciplinary Proceedings; Jurisdiction, Sanctions, Investigations, and Proceedings § 11.22 Investigations....

  4. 37 CFR 11.22 - Investigations.

    Code of Federal Regulations, 2011 CFR

    2011-07-01

    ... 37 Patents, Trademarks, and Copyrights 1 2011-07-01 2011-07-01 false Investigations. 11.22 Section... COMMERCE REPRESENTATION OF OTHERS BEFORE THE UNITED STATES PATENT AND TRADEMARK OFFICE Investigations and Disciplinary Proceedings; Jurisdiction, Sanctions, Investigations, and Proceedings § 11.22 Investigations....

  5. Strain relaxation of thick (11–22) semipolar InGaN layer for long wavelength nitride-based device

    SciTech Connect

    Kim, Jaehwan; Min, Daehong; Jang, Jongjin; Lee, Kyuseung; Chae, Sooryong; Nam, Okhyun

    2014-10-28

    In this study, the properties of thick stress-relaxed (11–22) semipolar InGaN layers were investigated. Owing to the inclination of growth orientation, misfit dislocations (MDs) occurred at the heterointerface when the strain state of the (11–22) semipolar InGaN layers reached the critical point. We found that unlike InGaN layers based on polar and nonpolar growth orientations, the surface morphologies of the stress-relaxed (11–22) semipolar InGaN layers did not differ from each other and were similar to the morphology of the underlying GaN layer. In addition, misfit strain across the whole InGaN layer was gradually relaxed by MD formation at the heterointerface. To minimize the effect of surface roughness and defects in GaN layers on the InGaN layer, we conducted further investigation on a thick (11–22) semipolar InGaN layer grown on an epitaxial lateral overgrown GaN template. We found that the lateral indium composition across the whole stress-relaxed InGaN layer was almost uniform. Therefore, thick stress-relaxed (11–22) semipolar InGaN layers are suitable candidates for use as underlying layers in long-wavelength devices, as they can be used to control strain accumulation in the heterostructure active region without additional influence of surface roughness.

  6. Characterization of GaN microstructures grown by plasma-assisted molecular beam epitaxy

    SciTech Connect

    Lo, Ikai; Pang, Wen-Yuan; Hsu, Yu-Chi; Hsieh, Chia-Ho; Shih, Cheng-Hung; Chou, Mitch M. C.; Chen, Wen-Yen; Hsu, Tzu-Min; Hsu, Gary Z. L.

    2013-06-15

    The characterization of GaN microstructures grown by plasma-assisted molecular beam epitaxy on LiAlO{sub 2} substrate was studied by cathodoluminescence and photoluminescence measurements. We demonstrated that the cathodoluminescence from oblique semi-polar surfaces of mushroom-shaped GaN was much brighter than that from top polar surface due to the reduction of polarization field on the oblique semi-polar surfaces. It implies that the oblique semi-polar surface is superior for the light-emitting surface of wurtzite nano-devices.

  7. Growth and characterization of nonpolar and semipolar group-III nitrides-based heterostructures and devices

    NASA Astrophysics Data System (ADS)

    Chakraborty, Arpan

    Conventional state-of-the-art wurtzite nitrides based light-emitters, grown along the polar c-direction, are characterized by the presence of polarization-induced electrostatic fields in the quantum wells. These built-in fields are detrimental to the performance of optoelectronic devices. Growth of light-emitters along nonpolar and semipolar directions is an effective means to circumvent the adverse effects of polarization. This dissertation focuses on the growth and characterization of nonpolar and semipolar (Al, Ga, In)N based heterostructures and devices. Two nonpolar planes, a- and m-, and two semipolar planes, (10 11) and (1013), have been investigated in this thesis. Initially, the growth of n-type and p-type nonpolar a-plane GaN was optimized to yield cladding layers of the highest possible conductivity in the devices. Various interesting observations, e.g. low acceptor activation energy, anisotropic conductivity, etc, were made during the course of this study. In order to achieve defect reduction in planar a-plane GaN films, in-situ SiNx interlayers were used as nano-mask. The effect of SiNx interlayer on the structural and optical properties of the overgrown GaN layer was investigated. Growth of InGaN/GaN multiple-quantum wells (MQWs) along nonpolar and semipolar planes was investigated and their structural and optical properties were studied. The effect of defects on the emission properties of the MQWs has been addressed. Optical measurements revealed the absence of polarization in the MQWs. Based on the MQW optimization, light-emitting diodes were grown on nonpolar and semipolar templates and their electrical and optical properties were studied. Electroluminescence measurement confirmed the absence of built-in electric fields in the quantum well. We demonstrated the first nonpolar and semipolar light-emitting diodes with milliwatt-range output power. DC output power as high as 0.6 mW at 20 mA and pulsed output power as high as 23.5 mW at 1 A were

  8. Self-assembled Multilayers of Silica Nanospheres for Defect Reduction in Non- and Semipolar Gallium Nitride Epitaxial Layers

    PubMed Central

    2015-01-01

    Non- and semipolar GaN have great potential to improve the efficiency of light emitting devices due to much reduced internal electric fields. However, heteroepitaxial GaN growth in these crystal orientations suffers from very high dislocation and stacking faults densities. Here, we report a facile method to obtain low defect density non- and semipolar heteroepitaxial GaN via selective area epitaxy using self-assembled multilayers of silica nanospheres (MSN). Nonpolar (11–20) and semipolar (11–22) GaN layers with high crystal quality have been achieved by epitaxial integration of the MSN and a simple one-step overgrowth process, by which both dislocation and basal plane stacking fault densities can be significantly reduced. The underlying defect reduction mechanisms include epitaxial growth through the MSN covered template, island nucleation via nanogaps in the MSN, and lateral overgrowth and coalescence above the MSN. InGaN/GaN multiple quantum wells structures grown on a nonpolar GaN/MSN template show more than 30-fold increase in the luminescence intensity compared to a control sample without the MSN. This self-assembled MSN technique provides a new platform for epitaxial growth of nitride semiconductors and offers unique opportunities for improving the material quality of GaN grown on other orientations and foreign substrates or heteroepitaxial growth of other lattice-mismatched materials. PMID:27065755

  9. Chemical etching behaviors of semipolar (11̄22) and nonpolar (11̄20) gallium nitride films.

    PubMed

    Jung, Younghun; Baik, Kwang Hyeon; Mastro, Michael A; Hite, Jennifer K; Eddy, Charles R; Kim, Jihyun

    2014-08-14

    Wet chemical etching using hot KOH and H3PO4 solutions was performed on semipolar (11̄22) and nonpolar (11̄20) GaN films grown on sapphire substrates. An alternating KOH/H3PO4/KOH etch process was developed to control the orientation of the facets on the thin-film surface. The initial etch step in KOH produced c- and m-plane facets on the surface of both semipolar (11̄22) and nonpolar (11̄20) GaN thin-films. A second etch step in H3PO4 solution additionally exposed a (̄1̄12̄2) plane, which is chemically stable in H3PO4 solution. By repeating the chemical etch with KOH solution, the m-plane facets as seen in the original KOH etch step were recovered. The etching methods developed in our work can be used to control the surface morphologies of nonpolar and semipolar GaN-based optoelectronic devices such as light-emitting diodes and solar cells. PMID:24971494

  10. Enhanced polarization of (11–22) semi-polar InGaN nanorod array structure

    SciTech Connect

    Athanasiou, M.; Smith, R. M.; Hou, Y.; Zhang, Y.; Gong, Y.; Wang, T.

    2015-10-05

    By means of a cost effective nanosphere lithography technique, an InGaN/GaN multiple quantum well structure grown on (11–22) semipolar GaN has been fabricated into two dimensional nanorod arrays which form a photonic crystal (PhC) structure. Such a PhC structure demonstrates not only significantly increased emission intensity, but also an enhanced polarization ratio of the emission. This is due to an effective inhibition of the emission in slab modes and then redistribution to the vertical direction, thus minimizing the light scattering processes that lead to randomizing of the optical polarization. The PhC structure is designed based on a standard finite-difference-time-domain simulation, and then optically confirmed by detailed time-resolved photoluminescence measurements. The results presented pave the way for the fabrication of semipolar InGaN/GaN based emitters with both high efficiency and highly polarized emission.

  11. Heteroepitaxy of nitrogen-polar, nonpolar, and semipolar gallium nitride by MOCVD

    NASA Astrophysics Data System (ADS)

    Sun, Qian

    Since the early breakthroughs of two-step GaN growth and Mg-acceptor activation by Prof. Akasaki in the 1980s and Dr. Nakamura in the 1990s, nearly all the works related to GaN-based materials and devices were performed on Ga-polar (0001) c-plane. In spite of its popularity and technological dominance, Ga-polar c-plane orientation has fundamental limitations, including the well-known quantum confined Stark effect (QCSE) and the difficulty in micro-fabrication due to its chemical inertness. In the recent years, there has been increasing interest in exploring other crystallographic orientations for high brightness light-emitting diodes, enhancement mode transistors, and novel bio/chemical sensors, to name a few possibilities. This dissertation presents our investigations on the heteroepitaxy of N-polar c-plane (0001&barbelow;), nonpolar a-plane (112&barbelow;0) and m-plane (101&barbelow;0), as well as semipolar (112&barbelow;2) GaN by metalorganic chemical vapor deposition (MOCVD). To bypass the conventional knob-turning exercise for optimizing GaN heteroepitaxy process for each orientation, we constructed the first kinetic Wulff plots (growth rate polar plots) through differential selective area growth. Insights from the kinetic Wulff plots were used to explain complex phenomena in nonpolar GaN growth, including island formation, surface pits, and surface striations. Based on the kinetic Wulff plots, we designed and carried out a two-step growth of nonpolar a-plane (112&barbelow;0) GaN on r-plane sapphire. By correlating the morphological evolution with the microstructure of a-plane GaN, we proposed a model for the reduction of basal-plane stacking faults (BSFs) and associated partial dislocations (PDs). For the growth of nonpolar m-plane (101&barbelow;0) GaN on m-plane SiC, we demonstrated an effective way (Al composition graded AlGaN layers) for reducing the BSF density. The possible mechanisms for the formation of BSFs in nonpolar and semipolar GaN were

  12. Self-assembled growth of inclined GaN nanorods on (10-10) m-plane sapphire using metal-organic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Chae, Sooryong; Lee, Kyuseung; Jang, Jongjin; Min, Daehong; Kim, Jaehwan; Nam, Okhyun

    2015-01-01

    We report the self-assembled growth of inclined and highly ordered GaN nanorods on (10-10) m-plane sapphire by metal-organic chemical vapor deposition, without metal catalyst. To determine the growth mechanism we performed a systematic study of the effect of the SiH4 flow, V/III ratio, growth temperature and growth time on growth behavior, demonstrating that optimized parameters were required for the growth of nanorods with high aspect ratios. High resolution X-ray diffraction showed that the nanorods were inclined at an angle of 58.4° with respect to the substrate normal and followed a well-defined epitaxial relationship with respect to the on-axis plane of the nanorods, the (11-22) semipolar plane, and the (10-10) m-plane sapphire. Finally cathodoluminescence showed that the near band edge emission of the Si-doped nanorod was asymmetric and broad owing to the band filling effect resulting from high carrier concentration, compared to the undoped GaN.

  13. Nonpolar and semipolar GaN, optical gain and efficiency

    NASA Astrophysics Data System (ADS)

    Park, Seoung-Hwan; Ahn, Doyeol

    2013-03-01

    Crystal orientation effects on electronic and optical properties of wurtzite (WZ) InGaN/GaN quantum wells (QWs) with piezoelectric (PZ) and spontaneous (SP) polarizations are investigated using the multiband effective-mass theory and non-Markovian optical model. Also, the electron overflow in non-polar InGaN/GaN QW structures with a superlattice (SL)-like electron injector (EI) layer is investigated using a simple model. The effective mass along k'y of the topmost valence band greatly decreases with increasing crystal angle while the y'-polarized optical matrix element significantly increases with increasing crystal angle. In particular, matrix elements of non-polar (1120)-oriented a-plane QW structure with a relatively higher In composition of 0.4 are about three and half times bigger than those of the (0001)-oriented c-plane QW structure. On the other hand, in the case of the QW structure with a relatively smaller In composition, the difference of matrix elements between the (0001)- and (1120)-oriented QW structures is smaller than that of the QW structure with a relatively higher In composition. With increasing crystal angle, the optical gain peak for the x'-polarization gradually decreases while that for the y'-polarization significantly increases. As a result, the in-plane optical anisotropy increases with increasing crystal angle. The in-plan optical anisotropy of non-polar a-plane QW structure gradually increases with increasing transition wavelength or In composition. The optical anisotropy is ranging from 0.50 at 400nm to 0.80 at 530 nm for the QW structure with Lw = 30 Å. It is found that the electron overflow is found to be greatly reduced by using the SL-like EI laye and rapidly decreases with increasing the number of EI layer. Hence, we expect that the droop phenomenon can be reduced by using the EI layers.

  14. Semipolar InGaN/GaN nanostructure light-emitting diodes on c-plane sapphire

    NASA Astrophysics Data System (ADS)

    Rishinaramangalam, Ashwin K.; Nami, Mohsen; Fairchild, Michael N.; Shima, Darryl M.; Balakrishnan, Ganesh; Brueck, S. R. J.; Feezell, Daniel F.

    2016-03-01

    The fabrication of electrically injected triangular-nanostripe core–shell semipolar III–nitride LEDs (TLEDs) is demonstrated using interferometric lithography and catalyst-free bottom-up selective-area metal–organic chemical vapor deposition (MOCVD). This alternative approach enables semipolar orientations on inexpensive, c-plane sapphire substrates, in comparison with planar growth on free-standing GaN substrates. Transmission electron microscopy and energy dispersive X-ray spectroscopy reveal nonuniform quantum well thickness and composition, respectively, as a function of location on the triangular stripes. The broad electroluminescence spectra, wavelength shift with increasing current density, and nonlinear light vs current characteristics are well correlated with the observed quantum-well nonuniformities.

  15. Progress toward achieving high power and high efficiency semipolar LEDs and their characterization

    NASA Astrophysics Data System (ADS)

    Zhong, Hong

    Performance of current commercially available wurtzite nitride based light-emitting diodes (LEDs), grown along the polar (0001) c-plane orientation, is limited by the presence of polarization-related electric fields inside multi-quantum wells (MQWs). The discontinuities in both spontaneous and piezoelectric polarization at the heterointerfaces result in internal electric fields in the quantum wells. These electric fields cause carrier separation [quantum confined Stark effect (QCSE)] and reduce the radiative recombination rate within the quantum wells. One approach to reduce and possibly eliminate the polarization-related effects is to grow III-nitride devices on crystal planes that are inclined with respect to the c-axis, i.e., on semipolar planes. In this dissertation, metalorganic chemical vapor deposition (MOCVD) has been employed for the homoepitaxial growth of GaN based LEDs on semipolar orientations. As a consequence of growing on high-quality bulk GaN substrates, the LEDs have significantly reduced threading dislocation and stacking fault densities, resulting in remarkable improvements in EQE and output power. High efficiency semipolar (1011) violet-blue and blue LEDs have been demonstrated without any intentional effort to enhance the light extraction from those devices. Optimizations of epitaxial structures have led to increased output power and external quantum efficiency. A silicone encapsulated single quantum well blue LED with peak wavelength of 444 nm with output power of 24.3 mW, external quantum efficiency of 43% and luminous efficacy of 75 lm/W (with phosphorescent coating) at 20 mA has been demonstrated. Polarization fields in strained (1011) and (112¯2) InGaN quantum wells have been experimentally determined through bias-dependent optical studies. Our results show that the polarization field flips its direction in semipolar InGaN quantum wells with large inclination angles (i.e. around 60°). This suggests that there exists a polarization

  16. White light-emitting diodes based on nonpolar and semipolar gallium nitride orientations

    NASA Astrophysics Data System (ADS)

    Demille, Natalie Fellows

    Gallium nitride has become one of the key components when fabricating white light-emitting diodes. Its use as the blue source in conjunction with a wavelength converter such as the yellow emitting phosphor YAG:Ce 3+ is a technology that is commercially available and usable for solid state lighting applications. Currently available white phosphor-based LEDs (pcLEDs) use the basal plane of wurtzite GaN as their source. Although research over the past couple decades has developed this technology into devices with good photometric performance and high reliability, the introduction of nonbasal plane wurtzite GaN orientations have benefits over basal plane GaN that can be incorporated into the white LED. The focus of this research deals with exploring white illumination on nonpolar and semipolar planes of GaN. Light extraction techniques will be described that allowed for high output powers and efficiencies on the c-plane as well as the (1100), (10 11), and (1122) planes of GaN. With higher performing devices, white pcLEDs were fabricated on c-plane, m-plane, and the (1011) semipolar plane. The novelty in the present research is producing white LEDs with nonbasal plane diodes which exhibit optical polarization anisotropy. This feature, absent on the basal plane, allows for tuning photometric quantities both electrically and optically. This is demonstrated on pcLEDs as well as dichromatic LEDs comprised solely of InGaN diodes. As a consequence of these measurements, an apparent optical polarization was seen to be occurring in the luminescence of the YAG:Ce3+ when the system absorbed linearly polarized light. Polarized emission in YAG:Ce3+ was explored by obtaining single crystals of YAG:Ce3+ with different planar orientations. The experiments led to the conclusion that crystal orientation plays no part in the optical polarization. It is suggested that the cause is a result of electric dipole transitions given by various selection rules between the Ce 3+ ion's 4f and 5d

  17. Heteroepitaxial growth of GaN on vertical Si{110} sidewalls formed on trench-etched Si(001) substrates

    NASA Astrophysics Data System (ADS)

    Gagnon, Jarod C.; Shen, Haoting; Yuwen, Yu; Wang, Ke; Mayer, Theresa S.; Redwing, Joan M.

    2016-07-01

    A maskless Si trench structure was developed to integrate crystallographically non-polar GaN microstructures with semi-polar facets on Si(001). GaN "fins" were preferentially grown by MOCVD on Si{110} trench sidewalls formed by deep reactive ion etching (DRIE) of Si(001) such that GaN(0001)//Si{110} and GaN(10-10)//Si(001), resulting in a non-polar crystal structure with respect to the Si(001) substrate surface. No masking layer was required to prevent GaN growth on the Si(001) top surface of the trenches, instead, it was found that GaN nucleated preferentially on the Si{110} trench sidewalls. GaN was also observed to nucleate at the top corner of the trenches due to Si etching and exposure of high-index Si facets during the pre-growth H2 anneal. This undesired GaN nucleation was successfully suppressed by reducing the H2 anneal time and/or increasing the growth temperature and decreasing the precursor V/III to enhance Ga-adatom diffusion. Cross-sectional TEM studies confirmed that the GaN fins were crystallographically non-polar with respect to the Si(001) substrate surface and were bounded by semi-polar and non-polar facets. The reported Si fabrication and GaN growth process shows promise for the integration of non-polar and semi-polar GaN microstructures on industry standard Si(001) substrates.

  18. 9 CFR 11.22 - Records required and disposition thereof.

    Code of Federal Regulations, 2013 CFR

    2013-01-01

    ..., DEPARTMENT OF AGRICULTURE ANIMAL WELFARE HORSE PROTECTION REGULATIONS § 11.22 Records required and disposition thereof. (a) The management of any horse show, horse exhibition, or horse sale or auction, that contains Tennessee Walking Horses or racking horses, shall maintain for a period of at least 90...

  19. 9 CFR 11.22 - Records required and disposition thereof.

    Code of Federal Regulations, 2012 CFR

    2012-01-01

    ..., DEPARTMENT OF AGRICULTURE ANIMAL WELFARE HORSE PROTECTION REGULATIONS § 11.22 Records required and disposition thereof. (a) The management of any horse show, horse exhibition, or horse sale or auction, that contains Tennessee Walking Horses or racking horses, shall maintain for a period of at least 90...

  20. 9 CFR 11.22 - Records required and disposition thereof.

    Code of Federal Regulations, 2014 CFR

    2014-01-01

    ..., DEPARTMENT OF AGRICULTURE ANIMAL WELFARE HORSE PROTECTION REGULATIONS § 11.22 Records required and disposition thereof. (a) The management of any horse show, horse exhibition, or horse sale or auction, that contains Tennessee Walking Horses or racking horses, shall maintain for a period of at least 90...

  1. 9 CFR 11.22 - Records required and disposition thereof.

    Code of Federal Regulations, 2011 CFR

    2011-01-01

    ..., DEPARTMENT OF AGRICULTURE ANIMAL WELFARE HORSE PROTECTION REGULATIONS § 11.22 Records required and disposition thereof. (a) The management of any horse show, horse exhibition, or horse sale or auction, that contains Tennessee Walking Horses or racking horses, shall maintain for a period of at least 90...

  2. 9 CFR 11.22 - Records required and disposition thereof.

    Code of Federal Regulations, 2010 CFR

    2010-01-01

    ..., DEPARTMENT OF AGRICULTURE ANIMAL WELFARE HORSE PROTECTION REGULATIONS § 11.22 Records required and disposition thereof. (a) The management of any horse show, horse exhibition, or horse sale or auction, that contains Tennessee Walking Horses or racking horses, shall maintain for a period of at least 90...

  3. High-power low-droop violet semipolar (303{sup ¯}1{sup ¯}) InGaN/GaN light-emitting diodes with thick active layer design

    SciTech Connect

    Becerra, Daniel L. Zhao, Yuji; Pynn, Christopher D.; Oh, Sang Ho; Fujito, Kenji; DenBaars, Steven P.; Nakamura, Shuji

    2014-10-27

    Devices grown on nonpolar and semipolar planes of GaN offer key performance advantages over devices grown on the conventional c-plane, including reduced polarization fields. This allows for a wider design space on semipolar planes for light emitting diodes (LEDs) to address the problem of efficiency droop at high current densities. LED structures with very thick (10–100 nm) InGaN single-quantum-well/double heterostructure active regions were grown using conventional metal organic chemical vapor deposition on semipolar (303{sup ¯}1{sup ¯}) free-standing GaN substrates and processed and packaged using conventional techniques. Simulated band diagrams showed reduced polarization fields on the (303{sup ¯}1{sup ¯}) plane. The calculated critical thickness for misfit dislocation formation is higher on the (303{sup ¯}1{sup ¯}) plane than on other semipolar planes, such as (202{sup ¯}1{sup ¯}), allowing for thicker active regions than our previous work to further reduce droop. The higher critical thickness was confirmed with defect characterization via cathodoluminescence. A trend is demonstrated in lower efficiency droop for devices with thicker active regions. Thermal droop characteristics of these devices are also presented. These observed results were utilized to demonstrate over 1 W of output power at a current density of 1 kA/cm{sup 2} from a single 0.1 mm{sup 2} LED device.

  4. Terahertz intersubband photodetectors based on semi-polar GaN/AlGaN heterostructures

    NASA Astrophysics Data System (ADS)

    Durmaz, Habibe; Nothern, Denis; Brummer, Gordie; Moustakas, Theodore D.; Paiella, Roberto

    2016-05-01

    Terahertz intersubband photodetectors are developed based on GaN/AlGaN quantum wells grown on a free-standing semi-polar ( 20 2 ¯ 1 ¯ ) GaN substrate. These quantum wells are nearly free of the polarization-induced internal electric fields that severely complicate the design of nitride intersubband devices on traditional c-plane substrates. As a result, a promising bound-to-quasi-bound THz photodetector design can be implemented. Pronounced photocurrent peaks at the design frequency near 10 THz are measured, covering frequencies that are fundamentally inaccessible to existing arsenide intersubband devices due to reststrahlen absorption. This materials system provides a favorable platform to utilize the intrinsic advantages of nitride semiconductors for THz optoelectronics.

  5. Anisotropic optical properties of semipolar AlGaN layers grown on m-plane sapphire

    NASA Astrophysics Data System (ADS)

    Feneberg, Martin; Winkler, Michael; Klamser, Juliane; Stellmach, Joachim; Frentrup, Martin; Ploch, Simon; Mehnke, Frank; Wernicke, Tim; Kneissl, Michael; Goldhahn, Rüdiger

    2015-05-01

    The valence band order of AlxGa 1 -x N is investigated experimentally by analyzing the anisotropic dielectric functions of semipolar (11 2 ¯ 2 ) AlGaN thin films grown on m-plane Al2O3. Point-by-point fitted dielectric functions are obtained by spectroscopic ellipsometry and corresponding inter-band transition energies are extracted. The known strain situation of the sample layers is used to correct for the small strain-induced energy shifts within k . p perturbation theory. It also is used to identify transitions related to the three valence bands. Transitions with E ⊥ c from the Γ9 valence band verify an inter-band bowing parameter of b =0.9 eV . The transitions with E || c allow determining the crystal field splitting energy which can be described by a linear interpolation between the values for GaN and AlN satisfactorily.

  6. Stress Engineering for Semipolar (2021) Blue and Green InGaN Based Laser Diodes

    NASA Astrophysics Data System (ADS)

    Hardy, Matthew Thomas

    High performance InGaN-based green laser diodes (LDs) will enable new laser-based display application. Semipolar (2021) offers advantages over conventional c-plane grown LDs in terms of reduced polarization related electric fields and higher differential gain. One of many challenges towards improving green LDs is the decrease in optical confinement factor (OCF) with lasing wavelength due to index dispersion. Relaxation of misfit strain via bend and glide of pre-existing threading dislocations (TDs) limits (2021) oriented LDs to lower waveguiding/cladding thickness relative to c-plane. Understanding and managing strain relaxation in semipolar GaN-based heterostructures is critical to the development of high performance semipolar oriented LDs. To establish a platform for studying stress management on (20 21) oriented LDs, coherent green LDs are developed. The link between post-QW annealing effects and the size of dark triangle defects is clarified and used to demonstrate 511 nm LDs with GaN barriers, having threshold current density (Jth) of 15 kA/cm-2. Additionally, the first true-green ITO-clad LD with a lasing wavelength of 518 nm is demonstrated. Secondary relaxation on inclined m-planes is observed, identified and linked to TD generation. Si and Mg doping is shown to significantly alter semipolar relaxation by suppressing m-plane slip significantly more than c-plane slip. 2D relaxation was investigated via thick, graded composition buffers and stripe patterning based elastic relaxation, but was always accompanied by TD generation in the mid 108--10 9 cm-2. Metamorphic LDs are developed utilizing 1D relaxed n-InGaN layers as the lower waveguide in GaN-clad LD structures. Hole blocking layers are found to significantly suppress MD related non-radiative losses. Blue LDs with Jth as low as 4 kA/cm-2 are demonstrated. Patterning mesas into the substrate before growth, known as limited area epitaxy (LAE), is shown to block TD glide. Using LAE, InGaN and AlGaN layers

  7. Step-induced misorientation of GaN grown on r-plane sapphire

    SciTech Connect

    Smalc-Koziorowska, J.; Dimitrakopulos, G. P.; Sahonta, S.-L.; Komninou, Ph.; Tsiakatouras, G.; Georgakilas, A.

    2008-07-14

    In the growth of nonpolar (1120) a-plane GaN on r-plane (1102) sapphire by plasma-assisted molecular beam epitaxy, misoriented crystallites are observed close to the substrate. They have average diameter {approx}10 nm and are oriented with the (0001){sub GaN} plane approximately parallel to the (2113){sub sapph.} plane and [0110]{sub GaN} parallel [1101]{sub sapph.}. This semipolar orientation is promoted by a low misfit (2.4%) between (1011){sub GaN} and (1210){sub sapph.} planes. Its introduction, after nitridation treatment, is due to GaN nucleation on (2113){sub sapph.} step facets inclined at 26 deg. relative to the r-plane. Two variants are observed, leading to twinning when they abut inside the epilayer.

  8. Polarization matching design of InGaN-based semi-polar quantum wells—A case study of (112{sup ¯}2) orientation

    SciTech Connect

    Kozlowski, Grzegorz Schulz, Stefan; Corbett, Brian

    2014-02-03

    We present a theoretical study of the polarization engineering in semi-polar III-nitrides heterostructures. As a case study, we investigate the influence of GaN, AlGaN, and AlInN barrier material on the performance of semi-polar (112{sup ¯}2) InGaN-based quantum wells (QWs) for blue (450 nm) and yellow (560 nm) emission. We show that the magnitude of the total built-in electric field across the QW can be controlled by the barrier material. Our results indicate that AlInN is a promising candidate to achieve (i) reduced wavelength shifts with increasing currents and (ii) strongly increased electron-hole wave function overlap, important for reduced optical recombination times.

  9. InGaN/GaN Multiple Quantum Well Light-Emitting Diodes grown on Polar, Semi-polar and Non-Polar Orientations

    NASA Astrophysics Data System (ADS)

    Mukund, Aadhithya Hosalli

    Cost effective solid-state lighting (SSL) is gaining much attention in recent years. As a result, there has been a great demand for high efficiency light emitting diodes (LEDs). InGaN/GaN multiple quantum well (MQW) based light-emitting diodes (LEDs) emitting in the blue/green region have emerged as promising candidates in realizing the next-generation SSL technology. InGaN/GaN quantum well structures for optoelectronic devices are conventionally grown on the c-plane (polar plane) which has a large polarization field. This large field within the quantum well structures results in a low rate of radiative recombination. This polarization issue is also partly responsible for the "green gap" or the poor external quantum efficiency observed for LEDs emitting in the green region of the visible spectrum and beyond. The alternative to this polarization issue is to grow on semi-polar orientations with a reduced field relative to the c-plane or on non-polar orientations which has zero polarization field. In this dissertation, alternative approaches to grow on semi-polar and nonpolar orientations are explored. The first of these approaches explores the possibility of growing on the facets of GaN nanowires that are oriented along desirable orientations from the perspective of polarization. A "proof of concept" LED structure, that has embedded voids, is overgrown on GaN nanowires. Three times improvement in the light-output power is observed for the LED overgrown on GaN nanowires relative to the conventional c-plane LED. The higher light-output power is attributed primarily to reduced piezo-electric fields and improved light extraction as a result of wave-guiding by the embedded voids. The second of these approaches explores the growth of MQW LEDs on semi-polar and non-polar bulk GaN substrates. A modified growth approach is used for incorporating higher amounts of indium to enable green-emitting MQWs. The challenges with these bulk GaN substrates and the effect of varying

  10. Reconstructions of the GaN(1011) surfaces: Density functional theory calculations

    NASA Astrophysics Data System (ADS)

    Hyun, Jung-Min; Kim, Yong-Sung; Kim, Hanchul

    2012-02-01

    GaN has been extensively studied for its potential applicability in optoelectronics as well as in spintronics. The functional performance in such applications depends on the surface characteristics of thin films. Thin films of GaN are typically grown along the polar [0001] direction, but their light-emission efficiency is reduced due to the electron-hole separation. A strategy to remedy such an undesired effect is to grow films along nonpolar or semipolar directions. In this presentation, we will address the reconstructions of the Ga-terminated semipolar (1011) surface. We performed the density functional theory calculations using the generalized gradient approximation, the projector augmented wave potentials, and the repeated slabs. From the calculated energetics of various reconstructions, we found that there exist a few structural motifs of GaN(1011). They are short Ga chains and Ga vacancies. For instance, a 4 x 2 reconstruction with a Ga tetramer and surface Ga vacancies is stable in the N-rich condition, which is significantly different from the previous results [Akiyama et al, Jpn. J. Appl. Phys. 48, 100201 (2009)]. Our results would provide a comprehensive understanding on the Ga-terminated semipolar surfaces.

  11. Fabrication of high-quality \\{11\\bar{2}2\\} GaN substrates using the Na flux method

    NASA Astrophysics Data System (ADS)

    Maruyama, Mihoko; Nakamura, Koshi; Che, Songbek; Murakami, Kosuke; Takazawa, Hideo; Imanishi, Masayuki; Imade, Mamoru; Morita, Yukihiro; Mori, Yusuke

    2016-05-01

    Gallium nitride (GaN) substrates fabricated along the nonpolar and semipolar directions are the most promising materials for realizing optical and electronic devices with low power consumption. In this study, we carry out the Na flux growth on \\{ 11\\bar{2}2\\} -plane GaN templates grown heteroepitaxially on sapphires. The GaN crystals are grown at low supersaturation using the Na flux method with the dipping technique. The crystallinity of the grown GaN crystals is improved compared to that of the seed substrates. Then it improves further by lowering the supersaturation. Finally, we succeed in fabricating a 2-in. \\{ 11\\bar{2}2\\} -plane GaN single crystal with high transparency and crystallinity.

  12. 43 CFR 11.22 - Sampling of potentially injured natural resources.

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... 43 Public Lands: Interior 1 2011-10-01 2011-10-01 false Sampling of potentially injured natural resources. 11.22 Section 11.22 Public Lands: Interior Office of the Secretary of the Interior NATURAL RESOURCE DAMAGE ASSESSMENTS Preassessment Phase § 11.22 Sampling of potentially injured natural resources. (a) General limitations. Until...

  13. 43 CFR 11.22 - Sampling of potentially injured natural resources.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... 43 Public Lands: Interior 1 2012-10-01 2011-10-01 true Sampling of potentially injured natural resources. 11.22 Section 11.22 Public Lands: Interior Office of the Secretary of the Interior NATURAL RESOURCE DAMAGE ASSESSMENTS Preassessment Phase § 11.22 Sampling of potentially injured natural resources. (a) General limitations. Until...

  14. 43 CFR 11.22 - Sampling of potentially injured natural resources.

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... resources. 11.22 Section 11.22 Public Lands: Interior Office of the Secretary of the Interior NATURAL RESOURCE DAMAGE ASSESSMENTS Preassessment Phase § 11.22 Sampling of potentially injured natural resources... of this part to proceed with an assessment, field sampling of natural resources should be limited...

  15. 43 CFR 11.22 - Sampling of potentially injured natural resources.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... resources. 11.22 Section 11.22 Public Lands: Interior Office of the Secretary of the Interior NATURAL RESOURCE DAMAGE ASSESSMENTS Preassessment Phase § 11.22 Sampling of potentially injured natural resources... of this part to proceed with an assessment, field sampling of natural resources should be limited...

  16. 43 CFR 11.22 - Sampling of potentially injured natural resources.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... resources. 11.22 Section 11.22 Public Lands: Interior Office of the Secretary of the Interior NATURAL RESOURCE DAMAGE ASSESSMENTS Preassessment Phase § 11.22 Sampling of potentially injured natural resources... of this part to proceed with an assessment, field sampling of natural resources should be limited...

  17. Strain relaxation in semipolar (20 2 ¯ 1 ) InGaN grown by plasma assisted molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Sawicka, M.; Kryśko, M.; Muziol, G.; Turski, H.; Siekacz, M.; Wolny, P.; Smalc-Koziorowska, J.; Skierbiszewski, C.

    2016-05-01

    Strain relaxation in semipolar (20 2 ¯ 1 ) InGaN layers grown by plasma assisted molecular beam epitaxy (PAMBE) was investigated with high-resolution X-ray diffraction (XRD) reciprocal space mapping, cathodoluminescence (CL), fluorescent light microscopy (FLM), and atomic force microscopy. We find that XRD detects lattice relaxation much later than its actual onset occurs. Other techniques used in this study allowed to detect local footprints of plastic relaxation before it was evidenced by XRD: at the initial stages of strain relaxation, we observed changes in layer morphology, i.e., formation of short trench line segments on the surface along the ⟨ 11 2 ¯ 0 ⟩ direction as well as dark lines in CL and FLM. The misfit dislocations formation and glide were observed in two slip systems: initially in basal slip system ⟨ 11 2 ¯ 0 ⟩{0001 } and for larger amount of strain in non-basal, prismatic slip system ⟨11 2 ¯ 0 ⟩{1 1 ¯ 00 } . Experimentally determined critical thickness for InGaN layers grown by PAMBE on semipolar (20 2 ¯ 1 ) bulk GaN substrates agrees well with literature data obtained with metalorganic vapor phase epitaxy and follows the Matthews-Blakeslee model prediction. We discuss the impact of substrate structural properties on the strain relaxation onset and mechanisms. We also describe the layer morphology and surface roughness evolution related to the increasing In content and strain relaxation of the semipolar (20 2 ¯ 1 ) InGaN layers.

  18. Strain Relaxation in Semipolar III-Nitrides for Light Emitting Diode Applications

    NASA Astrophysics Data System (ADS)

    Koslow, Ingrid Larson

    Light emitting diodes (LEDs) based on the III-nitride material system (Al,In,Ga)N have been utilized in a number of commercial applications, from small Christmas tree lights to high power lightbulbs and streetlamps. Until now, all commercially available GaN-based devices have been based on the conventional c-plane (polar) orientation of the Wurtzite crystal structure, and grown heteroepitaxially on foreign substrates such as sapphire. However, the recent availability of low defect density HVPE-grown GaN substrates have opened up new possibilities to study novel crystal orientations, known as nonpolar and semipolar. The (Al,In,Ga)N material system has bandgaps ranging from 0.7 eV in the infrared out to 6.3 eV in the deep UV---and LEDs with wavelengths from roughly 365 nm (near-UV) to 550 nm (green) are commercially available. However, although blue LEDs typically have an external quantum efficiency (EQE) > 60%, at emission wavelengths beyond 500 nm the EQE drops to ≤ 30%. Similarly, although red-emitting LEDs based on AlInGaP have high efficiency, their EQE is also reduced for yellow wavelengths. This phenomenon is known as the 'Green Gap'. Although there are likely to be numerous factors responsible for this reduction in efficiency with emission wavelength in III-nitrides, a leading candidate is mismatch strain between the active region of the LED---consisting of thin layers of InGaN with at least 30% indium---and the GaN substrate, which have a significant lattice constant mismatch of > 3%. In order to improve the efficiency of green-emitting LEDs, strain relaxation mechanisms on semipolar orientations have been studied. By growing relaxed InGaN buffer layers, it is possible to change the lattice constant from that of the GaN substrates, reducing the mismatch strain in the active region itself. Multiple slip systems have been observed and studied in semipolar nitrides, leading to several sets of misfit dislocations (MDs) that result in relaxation of InGaN layers

  19. Growth of GaN epilayers on c-, m-, a-, and (20.1)-plane GaN bulk substrates obtained by ammonothermal method

    NASA Astrophysics Data System (ADS)

    Rudziński, M.; Kudrawiec, R.; Janicki, L.; Serafinczuk, J.; Kucharski, R.; Zając, M.; Misiewicz, J.; Doradziński, R.; Dwiliński, R.; Strupiński, W.

    2011-08-01

    GaN epilayers were grown by metalorganic chemical vapor deposition (MOCVD) on c-, m-, a-, and (20.1)-plane GaN substrates obtained by the ammonothermal method. The influence of (i) the surface preparation of substrates, (ii) MOCVD growth parameters, and (iii) the crystallographic orientation of substrates on the structural and optical properties of GaN epilayers was investigated and carefully analyzed. It was observed that the polishing of substrates and their misorientation have strong impact on the quality of GaN epilayers grown on these substrates. The MOCVD growth process was optimized for epilayers grown on m-plane GaN substrates. The best structural and optical properties were achieved for epilayers deposited at 1075 °C and the total reactor pressure of 50 mbar. These conditions were applied to grow GaN epilayers on substrates with other ( c-, a-, and (20.1)-plane) crystallographic orientations in the same MOCVD process. Particularly good optical properties were obtained for GaN epilayers deposited on polar and non-polar ( m- and a-plane) substrates, whereas slightly worse optical properties were observed for epilayers deposited on the semi-polar substrate. It therefore means that MOCVD growth conditions optimized for a given crystallographic direction ( m-plane direction in this case) work rather well also for other crystallographic directions.

  20. Growth and fabrication of semi-polar InGaN/GaN multi-quantum well light-emitting diodes on microstructured Si (001) substrates

    NASA Astrophysics Data System (ADS)

    Chen, Long; Payne, Justin; Strate, Jan; Li, Cheng; Zhang, Jian-Ming; Yu, Wen-Jie; Di, Zeng-Feng; Wang, Xi

    2015-11-01

    Semi-polar (1 - 101) InGaN/GaN light-emitting diodes were prepared on standard electronic-grade Si (100) substrates. Micro-stripes of GaN and InGaN/GaN quantum wells on semi-polar facets were grown on intersecting {111} planes of microscale V-grooved Si in metal-organic vapor phase epitaxy, covering over 50% of the wafer surface area. In-situ optical reflectivity and curvature measurements demonstrate that the effect of the thermal expansion coefficient mismatch was greatly reduced. A cross-sectional analysis reveals low threading dislocation density on the top of most surfaces. On such prepared (1 - 101) GaN, an InGaN/GaN LED was fabricated. Electroluminescence over 5 mA to 60 mA is found with a much lower blue-shift than that on the c-plane device. Such structures therefore could allow higher efficiency light emitters with a weak quantum confined Stark effect throughout the visible spectrum.

  1. Improved Performance of (11bar 22) Semipolar InGaN/GaN Light-Emitting Diodes Grown Using a Hemispherically Patterned SiO2 Mask

    NASA Astrophysics Data System (ADS)

    Min, Daehong; Yoo, Geunho; Ryu, Yongwoo; Moon, Seunghwan; Nam, Kibum; Lim, Hongchul; Nam, Okhyun

    2013-10-01

    In this paper, we report on the improved performance of (11bar 22) semipolar InGaN/GaN light-emitting diodes (LEDs) grown using a hemispherically patterned SiO2 mask on an m-plane sapphire substrate (HP-SiO2), in comparison with a planar m-plane sapphire substrate and a hemispherically patterned m-plane sapphire substrate (HPSS), by metalorganic chemical vapor deposition. The full widths at half maximum of X-ray rocking curves for the on- and off-axes planes of the GaN layers on HP-SiO2 were the narrowest of the three samples. Cross-sectional transmission electron microscopy images showed larger low defect areas of GaN layers on HP-SiO2 than on HPSS. The electroluminescence results showed that the optical powers of LEDs on HPSS and HP-SiO2 increased by approximately 2.7 and 6 times, respectively, over that of m-planar sapphire at 100 mA. Our results suggest that the introduction of HP-SiO2 is very effective to improve the crystal quality as well as the light extraction efficiency of semipolar InGaN LEDs.

  2. Comparative study of field-dependent carrier dynamics and emission kinetics of InGaN/GaN light-emitting diodes grown on (112{sup ¯}2) semipolar versus (0001) polar planes

    SciTech Connect

    Ji, Yun; Liu, Wei; Chen, Rui; Tiam Tan, Swee; Zhang, Zi-Hui; Ju, Zhengang; Zhang, Xueliang; Sun, Handong; Wei Sun, Xiao; Erdem, Talha; Zhao, Yuji; DenBaars, Steven P. E-mail: volkan@stanfordalumni.org; Nakamura, Shuji; Volkan Demir, Hilmi E-mail: volkan@stanfordalumni.org

    2014-04-07

    The characteristics of electroluminescence (EL) and photoluminescence (PL) emission from GaN light-emitting diodes (LEDs) grown on (112{sup ¯}2) semipolar plane and (0001) polar plane have been comparatively investigated. Through different bias-dependent shifting trends observed from the PL and time-resolved PL spectra (TRPL) for the two types of LEDs, the carrier dynamics within the multiple quantum wells (MQWs) region is systematically analyzed and the distinct field-dependent emission kinetics are revealed. Moreover, the polarization induced internal electric field has been deduced for each of the LEDs. The relatively stable emission behavior observed in the semipolar LED is attributed to the smaller polarization induced internal electric field. The study provides meaningful insight for the design of quantum well (QW) structures with high radiative recombination rates.

  3. Surface thermal stability of free-standing GaN substrates

    NASA Astrophysics Data System (ADS)

    Okada, Shunsuke; Miyake, Hideto; Hiramatsu, Kazumasa; Miyagawa, Reina; Eryu, Osamu; Hashizume, Tamotsu

    2016-01-01

    The thermal stability of GaN surfaces was investigated with respect to homo-epitaxy on free-standing GaN substrates. Morphologies and etching rates of the GaN surfaces for free-standing polar (0001), nonpolar (10\\bar{1}0), and semipolar (20\\bar{2}1) and (20\\bar{2}\\bar{1}) planes were studied before and after thermal cleaning. In the case of the polar (0001) plane, polishing scratches disappeared after thermal cleaning at temperatures above 1000 °C. The surface morphology depended on not only the cleaning temperature, but also the substrate off-angle. The surface after thermal cleaning became rough for the substrate with off-angle less than 0.05°. In the case of nonpolar and semipolar planes after thermal cleaning, surface morphologies and etching rates were strongly dependent on the planes. A flat surface was maintained at cleaning temperatures up to 1100 °C for the (10\\bar{1}0) plane, but the surface of the (20\\bar{2}1) plane became rough with increasing cleaning temperature.

  4. Indium incorporation and emission wavelength of polar, nonpolar and semipolar InGaN quantum wells

    NASA Astrophysics Data System (ADS)

    Wernicke, Tim; Schade, Lukas; Netzel, Carsten; Rass, Jens; Hoffmann, Veit; Ploch, Simon; Knauer, Arne; Weyers, Markus; Schwarz, Ulrich; Kneissl, Michael

    2012-02-01

    InGaN quantum wells were grown by metal organic vapor-phase epitaxy on polar (0 0 0 1), nonpolar (1 0 \\bar{1} 0) and on semipolar (1 0 \\bar{1} 2), (1 1 \\bar{2} 2), (1 0 \\bar{1} 1) as well as (2 0 \\bar{2} 1) oriented GaN substrates. The room-temperature photoluminescence (PL) and electroluminescence (EL) emission energies for quantum wells grown on different crystal orientations show large variations of up to 600 meV. The following order of the emission energy was found throughout the entire range of growth temperatures: (1 0 \\bar{1} 1) < (1 1 \\bar{2} 2) = (0 0 0 1) < (2 0 \\bar{2} 1) < (1 0 \\bar{1} 0) = (1 0 \\bar{1} 2). In order to differentiate between the effects of strain, quantum-confined stark effect (QCSE) and indium incorporation the experimental data were compared to k.p theory-based calculations for differently oriented InGaN QWs. The major contribution to the shift between (1 0 \\bar{1} 0) and (0 0 0 1) InGaN quantum wells can be attributed to the QCSE. The redshift between (1 0 \\bar{1} 0) and the semipolar (1 0 \\bar{1} 2) and (2 0 \\bar{2} 1) QWs can be attributed to shear and anisotropic strain affecting the valence band structure. Finally, for (1 1 \\bar{2} 2) and (1 0 \\bar{1} 1) the emission energy shift could be attributed to a significantly higher indium incorporation efficiency.

  5. Growth and characterization of horizontal GaN wires on silicon

    SciTech Connect

    Zou, Xinbo; May Lau, Kei; Lu, Xing; Lucas, Ryan; Kuech, Thomas F.; Choi, Jonathan W.; Gopalan, Padma

    2014-06-30

    We report the growth of in-plane GaN wires on silicon by metalorganic chemical vapor deposition. Triangular-shaped GaN microwires with semi-polar sidewalls are observed to grow on top of a GaN/Si template patterned with nano-porous SiO{sub 2}. With a length-to-thickness ratio ∼200, the GaN wires are well aligned along the three equivalent 〈 112{sup ¯}0 〉 directions. Micro-Raman measurements indicate negligible stress and a low defect density inside the wires. Stacking faults were found to be the only defect type in the GaN wire by cross-sectional transmission electron microscopy. The GaN wires exhibited high conductivity, and the resistivity was 20–30 mΩ cm, regardless of the wire thickness. With proper heterostructure and doping design, these highly aligned GaN wires are promising for photonic and electronic applications monolithically integrated on silicon.

  6. Mechanism of selective area growth of GaN nanorods by pulsed mode metalorganic chemical vapor deposition

    SciTech Connect

    Lin, Yen-Ting; Yeh, Ting-Wei; Dapkus, P. Daniel

    2012-10-23

    The growth mechanism for the formation of GaN nanorods using metalorganic chemical vapor deposition (MOCVD) selective area growth by pulsed source injection is proposed. The pulsed mode procedure and the kinetic model are discussed and experiments performed to support the model are described. The achievement of rod shape nanostructures grown by the pulsed mode can be attributed to two mechanisms: (1) the differences in the adsorption/desorption behavior of Ga adatoms on the c-plane (0001) and the boundary m-planes $\\{ 1\\bar {1}0 0\\} $, and (2) the growth behavior of the semi-polar planes (especially the semi-polar $\\{ 1\\bar {1}0 1\\} $ plane).

  7. Evaluation of {11bar 22} Semipolar Multiple Quantum Wells Using Relaxed Thick InGaN Layers with Various In Compositions

    NASA Astrophysics Data System (ADS)

    Uchida, Katsumi; Miyoshi, Seita; Yamane, Keisuke; Okada, Narihito; Tadatomo, Kazuyuki; Kuwano, Noriyuki

    2013-08-01

    We have succeeded in the growth of a high-quality semipolar {11bar 22} GaN layer on an r-plane patterned sapphire substrate (r-PSS). In this study, we fabricated light-emitting diodes (LEDs) using relaxed thick InGaN layers with various In compositions. There were significant changes in polarization properties, indicating lattice mismatch reduction due to the use of a relaxed thick InGaN layer. Electroluminescence (EL) intensity was improved by using a relaxed thick InGaN layer with low In composition. In particular, the EL intensity improved approximately twofold compared with that in the case of LEDs without relaxed thick InGaN layers at an injection current of 200 mA.

  8. High-brightness semipolar (2021¯) blue InGaN/GaN superluminescent diodes for droop-free solid-state lighting and visible-light communications.

    PubMed

    Shen, Chao; Ng, Tien Khee; Leonard, John T; Pourhashemi, Arash; Nakamura, Shuji; DenBaars, Steven P; Speck, James S; Alyamani, Ahmed Y; El-Desouki, Munir M; Ooi, Boon S

    2016-06-01

    A high-brightness, droop-free, and speckle-free InGaN/GaN quantum well blue superluminescent diode (SLD) was demonstrated on a semipolar (2021¯) GaN substrate. The 447-nm emitting SLD has a broad spectral linewidth of 6.3 nm at an optical power of 123 mW. A peak optical power of 256 mW was achieved at 700 mA CW injection current. By combining YAG:Ce phosphor, SLD-generated white light shows a color-rendering index (CRI) of 68.9 and a correlated color temperature (CCT) of 4340 K. The measured frequency response of the SLD revealed a -3  dB bandwidth of 560 MHz, thus demonstrating the feasibility of the device for both solid-state lighting (SSL) and visible-light communication (VLC) applications. PMID:27244426

  9. Temporally and spatially resolved photoluminescence investigation of (112{sup ¯}2) semi-polar InGaN/GaN multiple quantum wells grown on nanorod templates

    SciTech Connect

    Liu, B.; Smith, R.; Athanasiou, M.; Yu, X.; Bai, J.; Wang, T.

    2014-12-29

    By means of time-resolved photoluminescence (PL) and confocal PL measurements, temporally and spatially resolved optical properties have been investigated on a number of In{sub x}Ga{sub 1−x}N/GaN multiple-quantum-well (MQW) structures with a wide range of indium content alloys from 13% to 35% on (112{sup ¯}2) semi-polar GaN with high crystal quality, obtained through overgrowth on nanorod templates. With increasing indium content, the radiative recombination lifetime initially increases as expected, but decreases if the indium content further increases to 35%, corresponding to emission in the green spectral region. The reduced radiative recombination lifetime leads to enhanced optical performance for the high indium content MQWs as a result of strong exciton localization, which is different from the behaviour of c-plane InGaN/GaN MQWs, where quantum confined Stark effect plays a dominating role in emission process.

  10. Markedly distinct growth characteristics of semipolar (112{sup ¯}2) and (1{sup ¯}1{sup ¯}22{sup ¯}) InGaN epitaxial layers

    SciTech Connect

    Nishinaka, Junichi; Funato, Mitsuru; Kawakami, Yoichi

    2015-02-23

    We compare metalorganic vapor phase epitaxy of InGaN/GaN heterostructures on semipolar (112{sup ¯}2) and (1{sup ¯}1{sup ¯}22{sup ¯}) GaN bulk substrates. In incorporation efficiency is higher for (112{sup ¯}2) InGaN, which enables higher temperature growth of InGaN and is beneficial for quality improvement. InGaN/GaN quantum wells (QWs) on (112{sup ¯}2) show abrupt interfaces, but those on (1{sup ¯}1{sup ¯}22{sup ¯}) tend to form three-dimensional nanofacets. Differences in growth temperature and structures of the (112{sup ¯}2) and (1{sup ¯}1{sup ¯}22{sup ¯}) QWs cause higher internal quantum efficiencies of the (112{sup ¯}2) [(1{sup ¯}1{sup ¯}22{sup ¯})] QWs at shorter (longer) wavelengths.

  11. 11. 22'X34' original blueprint, VariableAngle Launcher, 'SIDE VIEW CAMERA WOOD ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    11. 22'X34' original blueprint, Variable-Angle Launcher, 'SIDE VIEW CAMERA WOOD FRAME SUPERSTRUCTURE' drawn at 1/2'=1'-0'. (BOURD Sketch # 209125). - Variable Angle Launcher Complex, Camera Car & Track, CA State Highway 39 at Morris Reservior, Azusa, Los Angeles County, CA

  12. 11. 22'X34' original blueprint, VariableAngle Launcher, 'CONTROL STATION STRUCTURAL DETAILS' ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    11. 22'X34' original blueprint, Variable-Angle Launcher, 'CONTROL STATION STRUCTURAL DETAILS' drawn at 1 1/2'=1'-0'. (BUORD Sketch # 208401). - Variable Angle Launcher Complex, Control Station, CA State Highway 39 at Morris Reservior, Azusa, Los Angeles County, CA

  13. High Quality, Low Cost Ammonothermal Bulk GaN Substrates

    SciTech Connect

    Ehrentraut, D; Pakalapati, RT; Kamber, DS; Jiang, WK; Pocius, DW; Downey, BC; McLaurin, M; D'Evelyn, MP

    2013-12-18

    Ammonothermal GaN growth using a novel apparatus has been performed on c-plane, m-plane, and semipolar seed crystals with diameters between 5 mm and 2 in. to thicknesses of 0.5-3 mm. The highest growth rates are greater than 40 mu m/h and rates in the 10-30 mu m/h range are routinely observed for all orientations. These values are 5-100x larger than those achieved by conventional ammonothermal GaN growth. The crystals have been characterized by X-ray diffraction rocking-curve (XRC) analysis, optical and scanning electron microscopy (SEM), cathodoluminescence (CL), optical spectroscopy, and capacitance-voltage measurements. The crystallinity of the grown crystals is similar to or better than that of the seed crystals, with FWHM values of about 20-100 arcsec and dislocation densities of 1 x 10(5)-5 x 10(6) cm(-2). Dislocation densities below 10(4) cm(-2) are observed in laterally-grown crystals. Epitaxial InGaN quantum well structures have been successfully grown on ammonothermal wafers. (C) 2013 The Japan Society of Applied Physics

  14. Supernumerary chromosome marker Der(22)t(11;22) resulting from a maternal balanced translocation.

    PubMed

    Hou, Jia-Woei

    2003-01-01

    Derivative 22 [der(22)] syndrome is a rare disorder associated with multiple congenital anomalies including pre-auricular skin tags or pits, conotruncal heart defects, and profound mental retardation. Der(22)t(11;22) is one of the causes of supernumerary chromosome markers (mar) in humans. We present a boy with developmental delay and multiple anomalies consistent with the supernumerary der(22) syndrome. Cytogenetic analysis showed an abnormal chromosome complement of 47, XY, +mar in all 50 cells analyzed. The karyotype of his mother showed a reciprocal translocation over the distal bands 11q23 and 22q11, respectively, i.e., 46,XX,t( 11;22)(q23.3;q11.2), and that of his father was 46,XY. Thus, the nature of the supernumerary chromosome markers was of der(22)t(11 ;22)(q23.3;q11.2). The clinical features, including craniofacial dysmorphism, hypotonia, psychomotor retardation, heart defects, and urogenital anomalies, were the combined effects of partial trisomies for both distal 11q and pericentromeric 22q. PMID:12656309

  15. Inclined angle-controlled growth of GaN nanorods on m-sapphire by metal organic chemical vapor deposition without a catalyst

    NASA Astrophysics Data System (ADS)

    Lee, Kyuseung; Chae, Sooryong; Jang, Jongjin; Min, Daehong; Kim, Jaehwan; Eom, Daeyong; Yoo, Yang-Seok; Cho, Yong-Hoon; Nam, Okhyun

    2015-08-01

    In this study, we have intentionally grown novel types of (11-22)- and (1-10-3)-oriented3 and self-assembled inclined GaN nanorods (NRs) on (10-10) m-sapphire substrates using metal organic chemical vapor deposition without catalysts and ex situ patterning. Nitridation of the m-sapphire surface was observed to be crucial to the inclined angle as well as the growth direction of the GaN NRs. Polarity-selective KOH etching confirmed that both (11-22) and (1-10-3) GaN NRs are nitrogen-polar. Using pole figure measurements and selective area electron diffraction patterns, the epitaxial relationship between the inclined (11-22) and (1-10-3) GaN NRs and m-sapphire substrates was systematically demonstrated. Furthermore, it was verified that the GaN NRs were single-crystalline wurtzite structures. We observed that stacking fault-related defects were generated during the initial growth stage using high-resolution transmission electron microscopy. The blue-shift of the near band edge (NBE) peak in the inclined angle-controlled GaN NRs can be explained by a band filling effect through carrier saturation of the conduction band, resulting from a high Si-doping concentration; in addition, the decay time of NBE emission in (11-22)- and (1-10-3)-oriented NRs was much shorter than that of stacking fault-related emission. These results suggest that defect-free inclined GaN NRs can be grown on m-sapphire without ex situ treatment.

  16. Inclined angle-controlled growth of GaN nanorods on m-sapphire by metal organic chemical vapor deposition without a catalyst.

    PubMed

    Lee, Kyuseung; Chae, Sooryong; Jang, Jongjin; Min, Daehong; Kim, Jaehwan; Eom, Daeyong; Yoo, Yang-Seok; Cho, Yong-Hoon; Nam, Okhyun

    2015-08-21

    In this study, we have intentionally grown novel types of (11-22)- and (1-10-3)-oriented(3) and self-assembled inclined GaN nanorods (NRs) on (10-10) m-sapphire substrates using metal organic chemical vapor deposition without catalysts and ex situ patterning. Nitridation of the m-sapphire surface was observed to be crucial to the inclined angle as well as the growth direction of the GaN NRs. Polarity-selective KOH etching confirmed that both (11-22) and (1-10-3) GaN NRs are nitrogen-polar. Using pole figure measurements and selective area electron diffraction patterns, the epitaxial relationship between the inclined (11-22) and (1-10-3) GaN NRs and m-sapphire substrates was systematically demonstrated. Furthermore, it was verified that the GaN NRs were single-crystalline wurtzite structures. We observed that stacking fault-related defects were generated during the initial growth stage using high-resolution transmission electron microscopy. The blue-shift of the near band edge (NBE) peak in the inclined angle-controlled GaN NRs can be explained by a band filling effect through carrier saturation of the conduction band, resulting from a high Si-doping concentration; in addition, the decay time of NBE emission in (11-22)- and (1-10-3)-oriented NRs was much shorter than that of stacking fault-related emission. These results suggest that defect-free inclined GaN NRs can be grown on m-sapphire without ex situ treatment. PMID:26222432

  17. Stark effect in ensembles of polar (0001) Al{sub 0.5}Ga{sub 0.5}N/GaN quantum dots and comparison with semipolar (11−22) ones

    SciTech Connect

    Leroux, M.; Brault, J.; Kahouli, A.; Damilano, B.; Mierry, P. de; Korytov, M.; Maghraoui, D.; Kim, Je-Hyung; Cho, Yong-Hoon

    2014-07-21

    This work presents a continuous-wave photoluminescence study of Al{sub 0.5}Ga{sub 0.5}N/GaN quantum dots grown by ammonia-assisted molecular beam epitaxy on sapphire, either on the wurtzite polar (0001) or the semipolar (11−22) plane. Due to interface polarization discontinuities, the polar dots are strongly red-shifted by the Stark effect and emit in the visible range. Carrier injection screening of the polarization charges has been studied. A model relying on average dot heights and dot height variances, as measured by transmission electron microscopy, is proposed. It can account for the injection dependent luminescence energies and efficiencies. The electric field discontinuity deduced from the fittings is in good agreement with theoretical expectations for our barrier composition. On the contrary, semipolar quantum dot ensembles always emit above the gap of GaN strained to Al{sub 0.5}Ga{sub 0.5}N. Their luminescence linewidth is significantly lower than that of polar ones, and their energy does not shift with injection. Our study then confirms the expected strong decrease of the Stark effect for (11−22) grown (Al,Ga)N/GaN heterostructures.

  18. Growth and characterizations of semipolar (1122) InN

    SciTech Connect

    Dinh, Duc V.; Skuridina, D.; Solopow, S.; Frentrup, M.; Pristovsek, M.; Vogt, P.; Kneissl, M.; Ivaldi, F.; Kret, S.; Szczepanska, A.

    2012-07-01

    We report on metal-organic vapor phase epitaxial growth of (1122) InN on (1122) GaN templates on m-plane (1010) sapphire substrates. The in-plane relationship of the (1122) InN samples is [1123]{sub InN} Double-Vertical-Line Double-Vertical-Line [0001]{sub sapphire} and [1100]{sub InN} Double-Vertical-Line Double-Vertical-Line [1210]{sub sapphire}, replicating the in-plane relationship of the (1122) GaN templates. The surface of the (1122) InN samples and the (1122) GaN templates shows an undulation along [1100]{sub InN,GaN}, which is attributed to anisotropic diffusion of indium/gallium atoms on the (1122) surfaces. The growth rate of the (1122) InN layers was 3-4 times lower compared to c-plane (0001) InN. High resolution transmission electron microscopy showed a relaxed interface between the (1122) InN layers and the (1122) GaN templates, consistent with x-ray diffraction results. Basal plane stacking faults were found in the (1122) GaN templates but they were terminated at the InN/(1122) GaN interface due to the presence of misfit dislocations along the entire InN/GaN interface. The misfit dislocations were contributed to the fully relaxation and the tilts of the (1122) InN layers. X-ray photoelectron spectroscopy was used to determine the polarity of the grown (1122) InN sample, indicating an In-polar (1122) InN. The valence band maximum was determined to be at (1.7 {+-} 0.1) eV for the (1122) InN sample, comparable to In-polar c-plane InN.

  19. Xp11.22 Microduplications Including HUWE1: Case Report and Literature Review.

    PubMed

    Orivoli, Sonia; Pavlidis, Elena; Cantalupo, Gaetano; Pezzella, Marianna; Zara, Federico; Garavelli, Livia; Pisani, Francesco; Piccolo, Benedetta

    2016-01-01

    Xp11.22 microduplications have been reported in different patients with X-linked intellectual disability. Comparing the duplicated segments, a minimum region of overlap has been identified. Within this region, only one gene, the HUWE1 gene, coding the E3 ubiquitin protein ligase, turned out to be duplicated in all previously described patients. We provide a review of the literature on this topic, making a comparison not only of genetic aspects, but also of clinical, neurophysiological, and neuroradiological findings. Furthermore, we describe the phenotypic and molecular characterization of a case of intellectual disability in a child carrying one of the smallest Xp11.22 microduplications reported, involving the whole sequence of HUWE1 gene. Unlike previously described cases, our patient's neuroimaging showed abnormal findings; he also experienced one seizure and showed interictal electroencephalogram (EEG) epileptiform abnormalities. Given the fact that HUWE1 duplications and mutations have previously been described in several patients with X-linked cognitive impairment, our findings support the hypothesis that HUWE1 gene might be implicate in the pathogenesis of intellectual disability. Nevertheless, further investigations and a more detailed examination of patients' clinical history are needed to clear up other eventual genotype-phenotype correlations, such as the presence of epilepsy/epileptiform EEG abnormalities. PMID:26587761

  20. Understanding and controlling heteroepitaxy with the kinetic Wulff plot: A case study with GaN

    SciTech Connect

    Sun, Qian; Yerino, Christopher D.; Leung, Benjamin; Han, Jung; Coltrin, Michael E.

    2011-01-01

    This work represents a comprehensive attempt to correlate the heteroepitaxial dynamics in experiments with fundamental principles in crystal growth using the kinetic Wulff plot (or v-plot). Selective area growth is employed to monitor the advances of convex and concave facets toward the construction of a comprehensive v-plot as a guidepost for GaN-heteroepitaxy. A procedure is developed to apply the experimentally determined kinetic Wulff plots to the interpretation and the design of evolution dynamics in nucleation and island coalescence. This procedure offers a cohesive and rational model for GaN-heteroepitaxy on polar, nonpolar, and semipolar orientations and is broadly extensible to other heteroepitaxial material systems. We demonstrate furthermore that the control of morphological evolution, based on invoking a detailed knowledge of the v-plots, holds a key to the reduction of microstructural defects through effective bending of dislocations and geometrical blocking of stacking faults, paving a way to device-quality heteroepitaxial nonpolar and semipolar GaN materials.

  1. Direct spontaneous growth and interfacial structural properties of inclined GaN nanopillars on r-plane sapphire

    SciTech Connect

    Adikimenakis, A.; Aretouli, K. E.; Tsagaraki, K.; Androulidaki, M.; Georgakilas, A.; Lotsari, A.; Dimitrakopulos, G. P. Kehagias, Th.; Komninou, Ph.

    2015-06-28

    The spontaneous growth of GaN nanopillars (NPs) by direct plasma-assisted molecular beam epitaxy on nitridated r-plane sapphire substrates has been studied. The emanation of metal-polarity NPs from inside an a-plane nonpolar GaN film was found to depend on both the substrate nitridation and the growth conditions. The density of NPs increased with increasing the duration of the nitridation process and the power applied on the radio-frequency plasma source, as well as the III/V flux ratio, while variation of the first two parameters enhanced the roughness of the substrate's surface. Transmission electron microscopy (TEM) techniques were employed to reveal the structural characteristics of the NPs and their nucleation mechanism from steps on the sapphire surface and/or interfacial semipolar GaN nanocrystals. Lattice strain measurements showed a possible Al enrichment of the first 5–6 monolayers of the NPs. By combining cross-sectional and plan-view TEM observations, the three-dimensional model of the NPs was constructed. The orientation relationship and interfacial accommodation between the NPs and the nonpolar a-plane GaN film were also elucidated. The NPs exhibited strong and narrow excitonic emission, suggesting an excellent structural quality.

  2. Morphology Control of Hot-Wall MOCVD Selective Area Grown Hexagonal GaN Pyramids

    NASA Astrophysics Data System (ADS)

    Lundskog, Anders; Forsberg, Urban; Holtz, Per Olof; Janzen, Erik

    2012-11-01

    Morphological variations of gallium polar (0001)-oriented hexagonal GaN pyramids grown by hot wall metal organic chemical vapor deposition under various growth conditions are investigated. The stability of the semipolar {1 (1) over bar 02} and nonpolar {1 (1) over bar 00} facets is particularly discussed. The presence of the {1 (1) over bar 02} facets near the apex of the pyramid was found to be controllable by tuning the absolute flow rate of ammonia during the growth Vertical nonpolar {1 (1) over bar 00} facets appeared in gallium rich conditions, which automatically were created when the growth time was prolonged beyond pyramid completion. The result was attributed to a gallium passivation of the {1 (1) over bar 00} surface.

  3. Stacking fault emission in GaN: Influence of n-type doping

    NASA Astrophysics Data System (ADS)

    Hocker, M.; Tischer, I.; Neuschl, B.; Thonke, K.; Caliebe, M.; Klein, M.; Scholz, F.

    2016-05-01

    We present spatially and spectrally resolved cathodoluminescence investigations on the cross section of semipolar ( 11 2 ¯ 2 ) gallium nitride epitaxial layers with high background doping level. The locally varying high carrier concentration leads in emission to a free electron recombination band (FERB) governed on the high energy side by conduction band filling. For the basal plane stacking fault (BSF) of type I1, typically emitting at ≈3.41 eV in low doped GaN, we find a blue shift in emission correlated to the FERB high energy tail. This shift can be perfectly modeled and understood in a quantum well model for the BSF, taking also into account the varying doping level in the barrier region. Thus, the carrier concentration can be finally calculated either from the actual position of the I1 BSF or alternatively from the FERB-related near band edge emission.

  4. Genotype-phenotype characterization in 13 individuals with chromosome Xp11.22 duplications.

    PubMed

    Grams, Sarah E; Argiropoulos, Bob; Lines, Matthew; Chakraborty, Pranesh; Mcgowan-Jordan, Jean; Geraghty, Michael T; Tsang, Marilyn; Eswara, Marthand; Tezcan, Kamer; Adams, Kelly L; Linck, Leesa; Himes, Patricia; Kostiner, Dana; Zand, Dina J; Stalker, Heather; Driscoll, Daniel J; Huang, Taosheng; Rosenfeld, Jill A; Li, Xu; Chen, Emily

    2016-04-01

    We report 13 new individuals with duplications in Xp11.22-p11.23. The index family has one male and two female members in three generations with mild-severe intellectual disability (ID), speech delay, dysmorphic features, early puberty, constipation, and/or hand and foot abnormalities. Affected individuals were found to have two small duplications in Xp11.22 at nucleotide position (hg19) 50,112,063-50,456,458 bp (distal) and 53,160,114-53,713,154 bp (proximal). Collectively, these two regions include 14 RefSeq genes, prompting collection of a larger cohort of patients, in an attempt to delineate critical genes associated with the observed phenotype. In total, we have collected data on nine individuals with duplications overlapping the distal duplication region containing SHROOM4 and DGKK and eight individuals overlapping the proximal region including HUWE1. Duplications of HUWE1 have been previously associated with non-syndromic ID. Our data, with previously published reports, suggest that duplications involving SHROOM4 and DGKK may represent a new syndromic X-linked ID critical region associated with mild to severe ID, speech delay +/- dysarthria, attention deficit disorder, precocious puberty, constipation, and motor delay. We frequently observed foot abnormalities, 5th finger clinodactyly, tapering fingers, constipation, and exercise intolerance in patients with duplications of these two genes. Regarding duplications including the proximal region, our observations agree with previous studies, which have found associations with intellectual disability. In addition, expressive language delay, failure to thrive, motor delay, and 5th finger clinodactyly were also frequently observed in patients with the proximal duplication. © 2015 Wiley Periodicals, Inc. PMID:26692240

  5. Effect of defects in oxide templates on Non-catalytic growth of GaN nanowires for high-efficiency light-emitting diodes

    NASA Astrophysics Data System (ADS)

    Hwang, Sung Won; Choi, Suk-Ho

    2016-04-01

    Two kinds of oxide templates, one with and one without undercuts, are employed to study the effect of defects in oxide templates on non-catalytic growth of GaN nanowires (NWs). GaN NWs abnormally grown from the templates containing undercuts exhibit two types of patterns: earlystage growth of premature NWs and abnormally-overgrown (~2 μm) NWs. GaN NWs grown on perfectly-symmetric template patterns are highly crystalline and have high aspect ratios (2 ~ 5), and their tops are shaped as pyramids with semipolar facets, clearly indicating hexagonal symmetry. The internal quantum efficiency of the well-grown NWs is 10% larger than that of the deformed NWs, as estimated by using photoluminescence. These results suggest that our technique is an effective approach for growing large-area-patterned, vertically-aligned, hexagonal GaN NWs without catalysts, in strong contrast to catalytic vapor-liquid-solid growth, and that good formation of the oxide templates is crucial for the growth of high-quality GaN NWs.

  6. Basal Plane Stacking Fault Suppression by Nitrogen Carrier Gas in m-plane GaN Regrowth by Hydride Vapor Phase Epitaxy

    NASA Astrophysics Data System (ADS)

    Bryant, Benjamin N.; Young, Erin C.; Wu, Feng; Fujito, Kenji; Nakamura, Shuji; Speck, James S.

    2013-11-01

    In this study we demonstrate a direct correlation between carrier gas and the generation of basal plane stacking faults (BPSF) in m-plane GaN during hydride vapor phase epitaxy (HVPE) regrowth. Extended defects have hampered the expansion of non-polar and semi-polar GaN substrates. In this work, high-quality m-plane free-standing substrates were regrown by HVPE under a wide range of growth conditions and carrier gases. It was observed that hydrogen carrier gas in the HVPE growth promotes the creation of BPSF due to three-dimensional (3D) growth initiated from a masking effect. In contrast, nitrogen carrier gas suppresses 3D growth and thus BPSF generation.

  7. A unique case of der(11)t(11;22),−22 arising from 3 : 1 segregation of a maternal t(11;22) in a family with co-segregation of the translocation and breast cancer

    PubMed Central

    Jobanputra, Vaidehi; Chung, Wendy K.; Hacker, April M.; Emanuel, Beverly S.; Warburton, Dorothy

    2010-01-01

    Objective To report the first tertiary monosomy in a pregnancy loss to a female t(11;22) carrier. Methods The patient was a 34-year-old G10P1 female known to have a balanced translocation t(11;22)(q23;q11.2). She had one female livebirth (a translocation carrier) and eight miscarriages. Five female relatives known to be translocation carriers had a history of breast cancer, three of them premenopausally. The patient herself had a malignant melanoma. Results During the 10th pregnancy, ultrasound showed a viable embryo at 6 weeks of gestation, but loss of embryonic heartbeat by 7.5 weeks. Culture of the products of conception at 8 weeks of gestation showed the karyotype: 46,XY,+2,der(11)t(11;22)(q23;q11.2)mat, −22[4]/45,XY,der(11)t(11;22)(q23;q11.2)mat,−22[4], resulting from fertilization of the maternal 3 : 1 segregation product containing only the der(11) by a normal gamete. Subsequently, she became pregnant with a normal 46,XX fetus. FISH analysis indicated that the breakpoints on 11q and 22q in the patient were in the previously described region common to typical recurrent t(11;22). In addition, a nested-PCR-based approach showed that they were located within the same palindromic AT-rich sequence previously described. Conclusion This case demonstrates that the tertiary monosomy resulting from the 3 : 1 segregation is compatible with embryonic survival into the first trimester. It is also another example of apparent association of the constitutional translocation t(11;22) and breast cancer. PMID:16049998

  8. Atomic scattering spectroscopy for determination of the polarity of semipolar AlN grown on ZnO

    SciTech Connect

    Kobayashi, Atsushi; Ohta, Jitsuo; Ueno, Kohei; Oshima, Masaharu; Fujioka, Hiroshi

    2013-11-04

    Determination of the polarity of insulating semipolar AlN layers was achieved via atomic scattering spectroscopy. The back scattering of neutralized He atoms on AlN surfaces revealed the atomic alignment of the topmost layers of semipolar AlN and the ZnO substrate. Pole figures of the scattering intensity were used to readily determine the polarity of these wurtzite-type semipolar materials. In addition, we found that +R-plane AlN epitaxially grows on −R-plane ZnO, indicating that the polarity flips at the semipolar AlN/ZnO interface. This polarity flipping is possibly explained by the appearance of −c and m-faces on the −R ZnO surfaces, which was also revealed by atomic scattering spectroscopy.

  9. Molecular sublocalization and characterization of the 11; 22 translocation breakpoint in a malignant rhabdoid tumor

    SciTech Connect

    Newsham, I.; Daub, D.; Besnard-Guerin, C.; Cavenee, W. )

    1994-02-01

    Malignant rhabdoid tumors are extremely aggressive soft-tissue sarcomas that tend to be widely metastatic at diagnosis. These tumors were first described as variants of the kidney neoplasm Wilms' tumor, although tumors of similar clinicopathologic features have been cited in a variety of extrarenal sites. Here, the authors have characterized the chromosomal translocation t(11;22)(p15.5;q11.23) from a retroperitoneal rhabdoid tumor. Somatic cell hybrids with segregated copies of the derivative 11 and derivative 22 chromosomes allowed sublocalization of the chromosome 11 breakpoint to a 1- to 2-Mb region between the proximal marker D11S12 and the distal locus tyrosine hydroxylase (TH). Translocation-associated aberrant fragments were identified by pulsed-field gel electrophoresis, with the smallest resulting from BssHII digestion as detected with a probe for TH. These data indicate that the locus or loci disrupted by this genetic abnormality might lie less than 60 kb proximal to this marker and place it in the chromosomal vicinity of genes involved in the etiologies of rhabdomyosarcoma, Wilms' tumor, and the congenital overgrowth disorder, Beckwith-Wiedemann syndrome. Analysis of two other tumor-associated loci, EWS1 and NF2, that have been mapped to the general region of 22q11.2 indicated that they were not involved in this translocation breakpoint. Isolation of the genes present at this translocation junction on both chromosomes 11 and 22 may yield important clinicopathologic and genetic markers for this enigmatic tumor as well as other pediatric diseases. 45 refs., 3 figs.

  10. 41 CFR 302-11.22 - May the 2-year time limitation be extended by my agency?

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... 41 Public Contracts and Property Management 4 2010-07-01 2010-07-01 false May the 2-year time... Federal Travel Regulation System RELOCATION ALLOWANCES RESIDENCE TRANSACTION ALLOWANCES 11-ALLOWANCES FOR EXPENSES INCURRED IN CONNECTION WITH RESIDENCE TRANSACTIONS General Rules Time Limitations § 302-11.22...

  11. Band gaps and internal electric fields in semipolar short period InN/GaN superlattices

    SciTech Connect

    Gorczyca, I.; Skrobas, K.; Suski, T.; Christensen, N. E.; Svane, A.

    2014-06-09

    The electronic structures and internal electric fields of semipolar short-period mInN/nGaN superlattices (SLs) have been calculated for several compositions (m, n). Two types of SL are considered, (112{sup ¯}2) and (202{sup ¯}1), corresponding to growth along the wurtzite s2 and s6 directions, respectively. The results are compared to similar calculations for polar SLs (grown in the c-direction) and nonpolar SLs (grown in the a- and m-directions). The calculated band gaps for the semipolar SLs lie between those calculated for the nonpolar and polar SLs: For s2-SLs they fall slightly below the band gaps of a-plane SLs, whereas for s6-SLs they are considerably smaller.

  12. Formation and characteristics of AlGaN-based three-dimensional hexagonal nanopyramid semi-polar multiple quantum wells

    NASA Astrophysics Data System (ADS)

    Tian, Yingdong; Yan, Jianchang; Zhang, Yun; Zhang, Yonghui; Chen, Xiang; Guo, Yanan; Wang, Junxi; Li, Jinmin

    2016-05-01

    We demonstrated for the first time the formation and study of semi-polar AlGaN multiple-quantum-wells (MQWs) grown on highly regular hexagonal AlN nanopyramids. The AlN nanopyramids were obtained by a metal-organic chemical vapor phase deposition regrowth method on a well-ordered AlN nanorod array prepared by a top-down etching process. The growth mechanism of the AlN nanopyramids was ascribed to the slow growth of the (101&cmb.macr;1) semi-polar plane, which resulted from hydrogen passivation. Beneath the semi-polar facets, air voids were formed. This was attributed to the insufficient delivery of gas reactants to the bottom of the nanorods during the growth process. The polarization effect in semi-polar AlGaN MQWs was numerically calculated. The results showed that the internal electric field (IEF) in the semi-polar MQWs was remarkably reduced by 80% in comparison with c-plane MQWs. Power dependent photoluminescence indicated that the semi-polar AlGaN MQWs had negligible wavelength shifts that resulted from the reduced IEF, which was in accordance with theoretical predictions. In addition, epitaxial strain was greatly relieved in the AlN regrowth layer, which was revealed from the peak shift of the E2(high) phonon using micro-Raman spectroscopy. The advantages of AlGaN-based hexagonal nanopyramid semi-polar three dimensional nanostructures would lead to a large improvement of output power in UV-LEDs.

  13. Formation and characteristics of AlGaN-based three-dimensional hexagonal nanopyramid semi-polar multiple quantum wells.

    PubMed

    Tian, Yingdong; Yan, Jianchang; Zhang, Yun; Zhang, Yonghui; Chen, Xiang; Guo, Yanan; Wang, Junxi; Li, Jinmin

    2016-06-01

    We demonstrated for the first time the formation and study of semi-polar AlGaN multiple-quantum-wells (MQWs) grown on highly regular hexagonal AlN nanopyramids. The AlN nanopyramids were obtained by a metal-organic chemical vapor phase deposition regrowth method on a well-ordered AlN nanorod array prepared by a top-down etching process. The growth mechanism of the AlN nanopyramids was ascribed to the slow growth of the (101[combining macron]1) semi-polar plane, which resulted from hydrogen passivation. Beneath the semi-polar facets, air voids were formed. This was attributed to the insufficient delivery of gas reactants to the bottom of the nanorods during the growth process. The polarization effect in semi-polar AlGaN MQWs was numerically calculated. The results showed that the internal electric field (IEF) in the semi-polar MQWs was remarkably reduced by 80% in comparison with c-plane MQWs. Power dependent photoluminescence indicated that the semi-polar AlGaN MQWs had negligible wavelength shifts that resulted from the reduced IEF, which was in accordance with theoretical predictions. In addition, epitaxial strain was greatly relieved in the AlN regrowth layer, which was revealed from the peak shift of the E2(high) phonon using micro-Raman spectroscopy. The advantages of AlGaN-based hexagonal nanopyramid semi-polar three dimensional nanostructures would lead to a large improvement of output power in UV-LEDs. PMID:27174102

  14. Solubility and crystallographic facet tailoring of (GaN)1-x(ZnO)x pseudobinary solid-solution nanostructures as promising photocatalysts

    NASA Astrophysics Data System (ADS)

    Li, Jing; Liu, Baodan; Yang, Wenjin; Cho, Yujin; Zhang, Xinglai; Dierre, Benjamin; Sekiguchi, Takashi; Wu, Aimin; Jiang, Xin

    2016-02-01

    (GaN)1-x(ZnO)x solid-solution nanostructures with superior crystallinity, large surface areas and visible light absorption have been regarded as promising photocatalysts for overall water splitting to produce H2. In this work, we report the preparation of (GaN)1-x(ZnO)x solid-solution nanorods with a high ZnO solubility up to 95% via a two-step synthetic route, which starts from a sol-gel reaction and follows with a nitridation process. Moreover, we clearly demonstrated that the crystallographic facets of (GaN)1-x(ZnO)x solid-solution nanorods can be finely tailored from non-polar {101&cmb.macr;0} to semipolar {101&cmb.macr;1} and then finally to mixed {101&cmb.macr;1} and polar {0001&cmb.macr;} by carefully controlling the growth temperature and nitridation time. Correspondingly, the ZnO content in the GaN lattice can be achieved in the range of ~25%-95%. Room-temperature cathodoluminescence (CL) measurements on the three types of (GaN)1-x(ZnO)x solid-solution nanorods indicate that the minimum band-gap of 2.46 eV of the solid-solution nanorods is achieved under a ZnO solubility of 25%. The efficiency and versatility of our strategy in the band-gap and facet engineering of (GaN)1-x(ZnO)x solid-solution nanorods will enhance their promising photocatalytic utilizations like an overall water splitting for H2 production under visible-light irradiation.(GaN)1-x(ZnO)x solid-solution nanostructures with superior crystallinity, large surface areas and visible light absorption have been regarded as promising photocatalysts for overall water splitting to produce H2. In this work, we report the preparation of (GaN)1-x(ZnO)x solid-solution nanorods with a high ZnO solubility up to 95% via a two-step synthetic route, which starts from a sol-gel reaction and follows with a nitridation process. Moreover, we clearly demonstrated that the crystallographic facets of (GaN)1-x(ZnO)x solid-solution nanorods can be finely tailored from non-polar {101&cmb.macr;0} to semipolar {101&cmb

  15. Differential outcomes in an extended family with constitutional t(11;22)(q23.3;q11.2)

    PubMed Central

    Kee, Su Keyau; See, Valene Hsu-Lin; Chia, Patrick; Tan, Wei Ching; Tien, Sim Leng; Lim, Soon Tiong Alvin

    2013-01-01

    The t(11;22) rearrangement is the most common recurrent familial reciprocal translocation in man. Heterozygote carriers are phenotypically normal but are at risk of subfertility in the male, miscarriages, and producing chromosomally unbalanced offspring. The unbalanced progeny usually results from an extra der(22) chromosome resulting from a 3:1 malsegregation. We present here a family with t(11;22). Of six siblings, three were found to be carriers following prenatal diagnosis of the proband fetus. Neither of the two married carrier siblings have a live born child. In keeping with the prevailing knowledge of the pregnancy outcomes of heterozygote carriers, between the siblings they had recurrent miscarriages, a fetus with a +der(22) chromosome, and other subfertility issues resulting in multiple failed in vitro fertilization cycles with preimplantation genetic diagnosis. However, unlike the siblings, their extended family comprising their heterozygote translocation mother, married aunts and an uncle had normal fertility and a lack of a history of miscarriages or an abnormal child. The differing outcomes may be related to the male partners having additional semen anomalies which may further exacerbate problems associated with the t(11;22). Because the t(11;22) rearrangement tends to run in families, it is recommended that chromosome studies are offered to family members of an affected relative as an option, and provide them with appropriate genetic counseling so that they will have the necessary information with regard to their risk for subfertility, miscarriages, and production of viable unbalanced offspring. Follow-up prenatal diagnosis should also be offered to affected expectant family members, especially after preimplantation genetic diagnosis.

  16. Crystal orientation dependent intersubband transition in semipolar AlGaN/GaN single quantum well for optoelectronic applications

    NASA Astrophysics Data System (ADS)

    Fu, Houqiang; Lu, Zhijian; Huang, Xuanqi; Chen, Hong; Zhao, Yuji

    2016-05-01

    The optical properties of intersubband transition in a semipolar AlGaN/GaN single quantum well (SQW) are theoretically studied, and the results are compared with polar c-plane and nonpolar m-plane structures. The intersubband transition frequency, dipole matrix elements, and absorption spectra are calculated for SQW on different semipolar planes. It is found that SQW on a certain group of semipolar planes (55° < θ < 90° tilted from c-plane) exhibits low transition frequency and long wavelength response with high absorption quantum efficiency, which is attributed to the weak polarization-related effects. Furthermore, these semipolar SQWs show tunable transition frequency and absorption wavelength with different quantum well thicknesses, and stable device performance can be achieved with changing barrier thickness and Al compositions. All the results indicate that the semipolar AlGaN/GaN quantum wells are promising candidate for the design and fabrication of high performance low frequency and long wavelength optoelectronic devices.

  17. Impact of extended defects on optical properties of (1-101)GaN grown on patterned Si

    NASA Astrophysics Data System (ADS)

    Okur, S.; Izyumskaya, N.; Zhang, F.; Avrutin, V.; Metzner, S.; Karbaum, C.; Bertram, F.; Christen, J.; Morkoç, H.; Özgür, Ü.

    2014-03-01

    The optical quality of semipolar (1 101)GaN layers was explored by time- and polarization-resolved photoluminescence spectroscopy. High intensity bandedge emission was observed in +c-wing regions of the stripes as a result of better structural quality, while -c-wing regions were found to be of poorer optical quality due to basal plane and prismatic stacking faults (BSFs and PSFs) in addition to a high density of TDs. The high optical quality region formed on the +cwings was evidenced also from the much slower biexponential PL decays (0.22 ns and 1.70 ns) and an order of magnitude smaller amplitude ratio of the fast decay (nonradiative origin) to the slow decay component (radiative origin) compared to the -c-wing regions. In regard to defect-related emission, decay times for the BSF and PSF emission lines at 25 K (~ 0.80 ns and ~ 3.5 ns, respectively) were independent of the excitation density within the range employed (5 - 420 W/cm2), and much longer than that for the donor bound excitons (0.13 ns at 5 W/cm2 and 0.22 ns at 420 W/cm2). It was also found that the emission from BSFs had lower polarization degree (0.22) than that from donor bound excitons (0.35). The diminution of the polarization degree when photogenerated carriers recombine within the BSFs is another indication of the negative effects of stacking faults on the optical quality of the semipolar (1101)GaN. In addition, spatial distribution of defects in semipolar (1101)-oriented InGaN active region layers grown on stripe patterned Si substrates was investigated using near-field scanning optical microscopy. The optical quality of -c- wing regions was found to be worse compared to +c-wing regions due to the presence of higher density of stacking faults and threading dislocations. The emission from the +c-wings was very bright and relatively uniform across the sample, which is indicative of a homogeneous In distribution.

  18. Stable vicinal step orientations in m-plane GaN

    NASA Astrophysics Data System (ADS)

    Kelchner, K. M.; Kuritzky, L. Y.; Nakamura, S.; DenBaars, S. P.; Speck, J. S.

    2015-02-01

    The performance of InxGa1-xN-based m-plane LEDs and laser diodes grown by metalorganic chemical vapor deposition on bulk GaN substrates is currently limited by lower indium uptake and inhomogeneous linewidth broadening in the blue spectrum compared to semipolar planes and c-plane. Linewidth broadening is partially attributed to inhomogeneous indium composition that is associated with template morphology. We investigate the morphological evolution of homoepitaxial GaN growth on bulk m-plane substrates in three co-loaded miscut orientations: nominally on-axis, 1° in the -c-direction (-c-miscut), and 1° in the a-direction (a-miscut). Atomic force microscopy reveals four-sided pyramidal hillocks for on-axis growth with faces inclined toward the [ 11 2 bar 0 ]a-axis (a-faces) and the [0001] c-axis (c-faces). The a-faces exhibit steps oriented in an a+c direction with longer terrace widths than the c-face steps. The -c-miscut template growth sometimes forms diagonal striations, characterized by regions with stable a+c step direction. The a-miscut template growth exhibits meandering steps oriented in the a±c directions that bunch to form diagonal striations. These results reveal that c-direction steps are unstable compared to a±c directions. We further demonstrate that m-plane GaN substrates with combined a+c miscut lead to narrower InxGa1-xN photoluminescence emission spectra in blue with enhanced indium incorporation.

  19. ICP-RIE etching of polar, semi-polar and non-polar AlN: comparison of Cl2/Ar and Cl2/BCl3/Ar plasma chemistry and surface pretreatment

    NASA Astrophysics Data System (ADS)

    Shah, Amit P.; Azizur Rahman, A.; Bhattacharya, Arnab

    2015-01-01

    We report a comprehensive investigation of inductively-coupled plasma reactive ion etching (ICP-RIE) of polar (0001) c-plane, semi-polar (11-22) and non-polar (11-20) a-plane AlN epilayers and show that under optimized conditions a combination of BCl3-based surface oxide removal pretreatment and Cl2/Ar ICP etching allows fast etch rates (750 nm min-1) with a smooth surface morphology. We compare samples of different orientation etched in Cl2/Ar and Cl2/BCl3/Ar plasmas, with and without BCl3/Ar ICP pretreatment, and show that the effective removal of surface oxide is a crucial step for reliable ICP-RIE etching of AlN layers. For such pretreated samples, optimization of etch parameters such as RF power, ICP power, and chamber pressure then permit very high etch rates to be obtained with a smooth surface morphology. We also study the effect of varying the BCl3 fraction in BCl3/Cl2/Ar plasmas on the etch rate and surface morphology and find that increasing the BCl3 fraction reduces the etch rate for AlN. However, above 20% BCl3 content, samples with and without pre-treatment show similar etch rates.

  20. Identification of Multiple DNA Copy Number Alterations Including Frequent 8p11.22 Amplification in Conjunctival Squamous Cell Carcinoma

    PubMed Central

    Asnaghi, Laura; Alkatan, Hind; Mahale, Alka; Othman, Maha; Alwadani, Saeed; Al-Hussain, Hailah; Jastaneiah, Sabah; Yu, Wayne; Maktabi, Azza; Edward, Deepak P.; Eberhart, Charles G.

    2014-01-01

    Purpose. Little is known about the molecular alterations that drive formation and growth of conjunctival squamous cell carcinoma (cSCC). We therefore sought to identify genetic changes that could be used as diagnostic markers or therapeutic targets. Methods. The DNA extracted from 10 snap-frozen cSCC tumor specimens and 2 in situ carcinomas was analyzed using array-based comparative genomic hybridization (aCGH), and further examined with NanoString and quantitative PCR. Results. The number of regions of DNA loss ranged from 1 to 23 per tumor, whereas gains and amplifications ranged from 1 to 15 per tumor. Most large regions of chromosomal gain and loss were confirmed by NanoString karyotype analysis. The commonest alteration was amplification of 8p11.22 in 9 tumors (75%), and quantitative PCR analysis revealed 100-fold or greater overexpression of ADAM3A mRNA from 8p11.22 locus. In addition, recurring losses were observed at 14q13.2 and 22q11.23, both lost in 5 (42%) of the 12 tumors, and at 12p13.31, lost in 4 (33%) of the 12 samples. Of the eight loci associated with the DNA damage repair syndrome xeroderma pigmentosum, three showed loss of at least one allele in our aCGH analysis, including XPA (9q22.33, one tumor), XPE/DDB2 (11p11.2, one tumor) and XPG/ERCC5 (13q33.1, three tumors). Conclusions. Conjunctival SCC contains a range of chromosomal alterations potentially important in tumor formation and growth. Amplification of 8p11.22 and overexpression of ADAM3A suggests a potential role for this protease. Our findings also suggest that defects in DNA repair loci are important in sporadic cSCC. PMID:25491297

  1. Molecular characterization of the genomic breakpoint junction in a t(11;22) translocation in Ewing sarcoma.

    PubMed

    Obata, K; Hiraga, H; Nojima, T; Yoshida, M C; Abe, S

    1999-05-01

    Polymerase chain reaction (PCR)-based nucleotide sequence analysis was performed in 12 cases of Ewing sarcoma on the cDNA and/or genomic DNA breakpoint regions of a t(11;22)(q24;q12), which joins the EWS gene located on chromosome 22 with the FLI1 gene located on chromosome 11, in order to understand the molecular mechanism of this translocation. Reverse transcriptase-PCR on total tumor cell RNA from the examined cases showed five types of EWS-FLI1 chimeric product, resulting from various junctions between EWS exon 7 or 10 with FLI1 exon 5, 6, or 8. Sequencing of the genomic fusion junctions of EWS-FLI1 in seven cases showing three types of the chimeric cDNA products revealed that most of the breakpoint junctions shared common nucleotide(s) from both genes, and that the breakpoints in EWS introns 7 and 10 clustered within 100 bp and 300 bp, respectively. All the junctions were found to be flanked by various oligomers, among which a consensus sequence, 5'-AGAAAARDRR-3', was found near the breakpoints of both genes in four cases, suggesting that these oligomers may have a functional significance in the genesis of t(11;22). In addition to these oligomers, sequences highly homologous to Alu repeats and/or eukaryotic topoisomerase II cleavage sites were located near, or flanked, or even encompassed, the breakpoints in most of the cases examined. Thus, these sequences may also mediate DNA double-strand breakage and rejoining to generate the t(11;22). Genomic sequence analysis of both EWS-FLI1 and FLI1-EWS chimeric genes in three of the seven cases demonstrated a deletion and duplication of both EWS and FLI1 sequences in two cases and no gain or loss in one case. The present findings suggest that multiple mechanisms may be operative for the break and rejoining of the fragments of chromosomes 11 and 22 in the genesis of t(11;22), and that some of these translocations are asymmetric at the molecular level. PMID:10221334

  2. Dislocation Reduction and Stress Relaxation of GaN and InGaN Multiple Quantum Wells with Improved Performance via Serpentine Channel Patterned Mask.

    PubMed

    Ji, Qingbin; Li, Lei; Zhang, Wei; Wang, Jia; Liu, Peichi; Xie, Yahong; Yan, Tongxing; Yang, Wei; Chen, Weihua; Hu, Xiaodong

    2016-08-24

    The existence of high threading dislocation density (TDD) in GaN-based epilayers is a long unsolved problem, which hinders further applications of defect-sensitive GaN-based devices. Multiple-modulation of epitaxial lateral overgrowth (ELOG) is used to achieve high-quality GaN template on a novel serpentine channel patterned sapphire substrate (SCPSS). The dislocation blocking brought by the serpentine channel patterned mask, coupled with repeated dislocation bending, can reduce the dislocation density to a yet-to-be-optimized level of ∼2 × 10(5) to 2 × 10(6) cm(-2). About 80% area utilization rate of GaN with low TDD and stress relaxation is obtained. The periodical variations of dislocation density, optical properties and residual stress in GaN-based epilayers on SCPSS are analyzed. The quantum efficiency of InGaN/GaN multiple quantum wells (MQWs) on it can be increased by 52% compared with the conventional sapphire substrate. The reduced nonradiative recombination centers, the enhanced carrier localization, and the suppressed quantum confined Stark effect, are the main determinants of improved luminous performance in MQWs on SCPSS. This developed ELOG on serpentine shaped mask needs no interruption and regrowth, which can be a promising candidate for the heteroepitaxy of semipolar/nonpolar GaN and GaAs with high quality. PMID:27484167

  3. Reduction of Efficiency Droop in Semipolar (1101) InGaN/GaN Light Emitting Diodes Grown on Patterned Silicon Substrates

    NASA Astrophysics Data System (ADS)

    Chiu, Ching-Hsueh; Lin, Da-Wei; Lin, Chien-Chung; Li, Zhen-Yu; Chang, Wei-Ting; Hsu, Hung-Wen; Kuo, Hao-Chung; Lu, Tien-Chang; Wang, Shing-Chung; Liao, Wei-Tsai; Tanikawa, Tomoyuki; Honda, Yoshio; Yamaguchi, Masahito; Sawaki, Nobuhiko

    2011-01-01

    We present a study of semi-polar (1101) InGaN-based light emitting diodes (LEDs) grown on patterned (001) Si substrates by atmospheric-pressure metal organic chemical vapor deposition. A transmission electron microscopy image of the semi-polar template shows that the threading dislocation density was decreased significantly. From electroluminescence measurement, semi-polar LEDs exhibit little blue-shift and low efficiency droop at a high injection current because the reduction of the polarization field not only made the band diagram smoother but also restricted electron overflow to the p-GaN layer as shown in simulations. These results indicate that semi-polar InGaN-based LEDs can possess a high radiative recombination rate and low efficiency droop at a high injection current.

  4. Analysis of low efficiency droop of semipolar InGaN quantum well light-emitting diodes by modified rate equation with weak phase-space filling effect

    NASA Astrophysics Data System (ADS)

    Fu, Houqiang; Lu, Zhijian; Zhao, Yuji

    2016-06-01

    We study the low efficiency droop characteristics of semipolar InGaN light-emitting diodes (LEDs) using modified rate equation incoporating the phase-space filling (PSF) effect where the results on c-plane LEDs are also obtained and compared. Internal quantum efficiency (IQE) of LEDs was simulated using a modified ABC model with different PSF filling (n0), Shockley-Read-Hall (A), radiative (B), Auger (C) coefficients and different active layer thickness (d), where the PSF effect showed a strong impact on the simulated LED efficiency results. A weaker PSF effect was found for low-droop semipolar LEDs possibly due to small quantum confined Stark effect, short carrier lifetime, and small average carrier density. A very good agreement between experimental data and the theoretical modeling was obtained for low-droop semipolar LEDs with weak PSF effect. These results suggest the low droop performance may be explained by different mechanisms for semipolar LEDs.

  5. Ba4GaN3O

    PubMed Central

    Hashimoto, Takayuki; Yamane, Hisanori

    2014-01-01

    Red transparant platelet-shaped single crystals of tetra­barium gallium trinitride oxide, Ba4GaN3O, were synthesized by the Na flux method. The crystal structure is isotypic with Sr4GaN3O, containing isolated triangular [GaN3]6− anionic groups. O2− atoms are inserted between the slabs of [Ba4GaN3]2+, in which the [GaN3]6− groups are surrounded by Ba2+ atoms. PMID:24940188

  6. Physical mapping of Xp11.22-Xp11.3; an interval containing the RP2 gene

    SciTech Connect

    Thiselton, D.L.; Hardcastle, A.J.; Kamakari, S.

    1994-09-01

    Genetic linkage studies have established a region on the short arm of the human X chromosome (Xp11.22-Xp11.3) to be implicated in several inherited opthalmic diseases. Aland Island eye disease (AIED), congenital stationary night blindness 1 (CSNB1), X-linked progressive cone dystrophy and one form of retinitis pigmentosa (RP2) all map to the interval. A lack of multiple informative recombinants in RP2 families, coupled with the paucity of highly polymorphic markers in this region, has to date impeded progress in refining the genetic interval containing this gene. A YAC contig is being generated as a total for the isolation of microsatellites and candidate genes in the region of interest. This contig will be constructed to cover and extend beyond the two markers flanking this interval, MAO (Xp11.3) and DXS255 (Xp11.22), a genetic distance of approximately 9 cM. Since the best evidence for linkage to RP2 is with the markers DXS255 and DXS426 (Xp11.23), these were used to initiate the construction of a contig utilizing a PCR-based screening strategy on the ICI 4X YAC library. Other STSs derived from genes and known microsatellite markers in the region were likewise used to obtain seed YACs within this interval. End sequences from such YACs have been obtained by a combination of Alu-vector PCR and chemical genetics methodologies to generate novel STSs with which to isolate overlapping clones. A complete contig is now assembled from TIMP to DXS1126, encompassing a physical distance of approximately 2-3 Mb. Microsatellite markers are being isolated from YACs which appear to span critical cross-overs in affected RP2 patients. In this way we hope to refine the localization of the RP2 gene. Key YACs will then be analyzed for CpG islands and retinally expressed sequences which may become candidate genes for the several opthalmic diseases mapping to Xp11.

  7. Carrier transport in dichromatic color-coded semipolar (2021) and (2021) III-N LEDs

    NASA Astrophysics Data System (ADS)

    Kisin, Mikhail V.; Huang, Chih-Li; El-Ghoroury, Hussein S.

    2014-03-01

    Simulation of III-nitride color-coded multiple quantum well (MQW) LED structures was performed using as an experimental benchmark dichromatic semipolar LEDs grown in Ga-polar and N-polar crystallographic orientations (Y. Kawaguchi et.al, APL 100, 231110, 2012). Different QW depths in the color-coded LEDs and opposite interface polarization charges in Ga-polar and N-polar structures provide different conditions for carrier transport across the LED active regions. Combination of several effects was crucial for adequate reproduction of the emission spectra experimentally observed in color-coded structures with violet-aquamarine and aquamarine-violet active region layouts. A standard drift-diffusion transport model wascompleted with rate equations for nonequilibrium QW populations and several high-energy transport features, including the effects of QW carrier overshoot and Auger-assisted QW depopulation. COMSOL-based Optoelectronic Device Modeling Software (ODMS) developed at Ostendo Technologies Inc. was utilized for device simulation.

  8. Green semipolar III-nitride light-emitting diodes grown by limited area epitaxy

    NASA Astrophysics Data System (ADS)

    Pynn, C. D.; Kowsz, S. J.; Oh, S. H.; Gardner, H.; Farrell, R. M.; Nakamura, S.; Speck, J. S.; DenBaars, S. P.

    2016-07-01

    The performance of multiple quantum well green and yellow semipolar light-emitting diodes (LEDs) is limited by relaxation of highly strained InGaN-based active regions and the subsequent formation of nonradiative defects. Limited area epitaxy was used to block glide of substrate threading dislocations and to reduce the density of misfit dislocations (MDs) directly beneath the active region of (20 2 ¯ 1 ) LEDs. Devices were grown and fabricated on a 1D array of narrow substrate mesas to limit the MD run length. Reducing the mesa width from 20 μm to 5 μm lowered the density of basal plane and non-basal plane MDs on the mesas and limited the number of defect-generating dislocation intersections. This improvement in material quality yielded a 73% enhancement in peak external quantum efficiency for the devices with the narrowest mesas compared to the devices with the widest mesas.

  9. Surface phonon polariton responses of hexagonal sapphire crystals with non-polar and semi-polar crystallographic planes.

    PubMed

    Lee, Sai Cheong; Ng, Sha Shiong; Hassan, Haslan Abu; Hassan, Zainuriah; Dumelow, Thomas

    2014-09-15

    The surface phonon polariton (SPhP) characteristics of hexagonal sapphire crystals with non-polar and semi-polar crystallographic planes are investigated. A formulation that considers the effects of crystal orientation is employed to calculate the SPhP dispersion curves of the samples. The SPhP dispersion curves indicate that the SPhP responses of sapphire crystals in non-polar and semi-polar orientations are directionally sensitive. Resonance frequencies and spectral strengths of the SPhP modes can be modulated simply by tuning the angular positions of the samples. The validity of the theoretical results is confirmed by the polarized infrared attenuated total reflection measurements. PMID:26466299

  10. Built-in electric field in ZnO based semipolar quantum wells grown on (1012) ZnO substrates

    SciTech Connect

    Chauveau, J.-M.; Xia, Y.; Roland, B.; Vinter, B.; University of Nice Sophia Antipolis, Parc Valrose, F-06102 Nice Cedex 2 ; Ben Taazaet-Belgacem, I.; Teisseire, M.; Nemoz, M.; Brault, J.; Damilano, B.; Leroux, M.

    2013-12-23

    We report on the properties of semipolar (Zn,Mg)O/ZnO quantum wells homoepitaxially grown by molecular beam epitaxy on (1012) R-plane ZnO substrates. We demonstrate that atomically flat interfaces can be achieved with fully relaxed quantum wells because the mismatch between (Zn,Mg)O and ZnO is minimal for this growth orientation. The photoluminescence properties evidence a quantum confined Stark effect with an internal electric field estimated to 430 kV/cm for a 17% Mg content in the barriers. The quantum well emission is strongly polarized along the 1210 direction and a comparison with the semipolar bulk ZnO luminescence polarization points to the effect of the confinement.

  11. Enhanced Light Emission due to Formation of Semi-polar InGaN/GaN Multi-quantum Wells.

    PubMed

    Zhao, Wan-Ru; Weng, Guo-En; Wang, Jian-Yu; Zhang, Jiang-Yong; Liang, Hong-Wei; Sekiguchi, Takashi; Zhang, Bao-Ping

    2015-12-01

    InGaN/GaN multi-quantum wells (MQWs) are grown on (0001) sapphire substrates by metal organic chemical vapor deposition (MOCVD) with special growth parameters to form V-shaped pits simultaneously. Measurements by atomic force microscopy (AFM) and transmission electron microscopy (TEM) demonstrate the formation of MQWs on both (0001) and ([Formula: see text]) side surface of the V-shaped pits. The latter is known to be a semi-polar surface. Optical characterizations together with theoretical calculation enable us to identify the optical transitions from these MQWs. The layer thickness on ([Formula: see text]) surface is smaller than that on (0001) surface, and the energy level in the ([Formula: see text]) semi-polar quantum well (QW) is higher than in the (0001) QW. As the sample temperature is increased from 15 K, the integrated cathodoluminescence (CL) intensity of (0001) MQWs increases first and then decreases while that of the ([Formula: see text]) MQWs decreases monotonically. The integrated photoluminescence (PL) intensity of (0001) MQWs increases significantly from 15 to 70 K. These results are explained by carrier injection from ([Formula: see text]) to (0001) MQWs due to thermal excitation. It is therefore concluded that the emission efficiency of (0001) MQWs at high temperatures can be greatly improved due to the formation of semi-polar MQWs. PMID:26625883

  12. GaN High Power Devices

    SciTech Connect

    PEARTON,S.J.; REN,F.; ZHANG,A.P.; DANG,G.; CAO,X.A.; LEE,K.P.; CHO,H.; GILA,B.P.; JOHNSON,J.W.; MONIER,C.; ABERNATHY,C.R.; HAN,JUNG; BACA,ALBERT G.; CHYI,J.-I.; LEE,C.-M.; NEE,T.-E.; CHUO,C.-C.; CHI,G.C.; CHU,S.N.G.

    2000-07-17

    A brief review is given of recent progress in fabrication of high voltage GaN and AlGaN rectifiers, GaN/AlGaN heterojunction bipolar transistors, GaN heterostructure and metal-oxide semiconductor field effect transistors. Improvements in epitaxial layer quality and in fabrication techniques have led to significant advances in device performance.

  13. Bandgap engineering of GaN nanowires

    NASA Astrophysics Data System (ADS)

    Ming, Bang-Ming; Wang, Ru-Zhi; Yam, Chi-Yung; Xu, Li-Chun; Lau, Woon-Ming; Yan, Hui

    2016-05-01

    Bandgap engineering has been a powerful technique for manipulating the electronic and optical properties of semiconductors. In this work, a systematic investigation of the electronic properties of [0001] GaN nanowires was carried out using the density functional based tight-binding method (DFTB). We studied the effects of geometric structure and uniaxial strain on the electronic properties of GaN nanowires with diameters ranging from 0.8 to 10 nm. Our results show that the band gap of GaN nanowires depends linearly on both the surface to volume ratio (S/V) and tensile strain. The band gap of GaN nanowires increases linearly with S/V, while it decreases linearly with increasing tensile strain. These linear relationships provide an effect way in designing GaN nanowires for their applications in novel nano-devices.

  14. Influence of composition, strain, and electric field anisotropy on different emission colors and recombination dynamics from InGaN nanodisks in pencil-like GaN nanowires

    NASA Astrophysics Data System (ADS)

    Gačević, Ž.; Vukmirović, N.; García-Lepetit, N.; Torres-Pardo, A.; Müller, M.; Metzner, S.; Albert, S.; Bengoechea-Encabo, A.; Bertram, F.; Veit, P.; Christen, J.; González-Calbet, J. M.; Calleja, E.

    2016-03-01

    This work reports an experimental and theoretical insight into phenomena of two-color emission and different electron-hole recombination dynamics in InGaN nanodisks, incorporated into pencil-like GaN nanowires. The studied nanodisks consist of one polar (on c facet) and six (nominally) identical semipolar (on r facets) sections, as confirmed by transmission electron microscopy. The combination of cathodoluminescence with scanning electron microscopy spatially resolves the nanodisk two-color emission, the low-energy emission (˜500 nm) originating from the polar section, and the high-energy emission (˜400 nm) originating from the semipolar section. This result has been directly linked to a "facet-dependent" nanodisk composition, the In content being significantly higher in the polar (˜20 % ) vs semipolar (˜10 % ) section (as quantified by energy dispersive x-ray spectroscopy), further leading to a strong facet-dependent strain anisotropy. Time-resolved cathodoluminescence reveals significantly different electron-hole recombination times in the two sections, moderately fast (˜1.3 ns) vs fast (˜0.5 ns) in polar/semipolar sections, respectively, the difference being linked to a strong anisotropy in the nanodisk internal electric fields. To determine the influence of each of the three contributing "facet-related" anisotropies (composition, strain, and electric field) on the two-color emission, a proper simulation [relying on virtual crystal approximation and involving three-dimensional (3D) continuum mechanical modeling, a 3D Poisson equation, and a one-dimensional Schrödinger equation] has been performed. The theoretical simulations allow the three effects to be quantitatively disentangled, revealing a clear hierarchy among their contributing weights, the facet-dependent composition inhomogeneity being identified as the dominant one (and the strain inhomogeneity being identified as the least significant one). As for different recombination times, while it is

  15. Transparent conducting oxide clad limited area epitaxy semipolar III-nitride laser diodes

    NASA Astrophysics Data System (ADS)

    Myzaferi, A.; Reading, A. H.; Cohen, D. A.; Farrell, R. M.; Nakamura, S.; Speck, J. S.; DenBaars, S. P.

    2016-08-01

    The bottom cladding design of semipolar III-nitride laser diodes is limited by stress relaxation via misfit dislocations that form via the glide of pre-existing threading dislocations (TDs), whereas the top cladding is limited by the growth time and temperature of the p-type layers. These design limitations have individually been addressed by using limited area epitaxy (LAE) to block TD glide in n-type AlGaN bottom cladding layers and by using transparent conducting oxide (TCO) top cladding layers to reduce the growth time and temperature of the p-type layers. In addition, a TCO-based top cladding should have significantly lower resistivity than a conventional p-type (Al)GaN top cladding. In this work, LAE and indium-tin-oxide cladding layers are used simultaneously in a ( 20 2 ¯ 1 ) III-nitride laser structure. Lasing was achieved at 446 nm with a threshold current density of 8.5 kA/cm2 and a threshold voltage of 8.4 V.

  16. Determination of lattice parameters, strain state and composition in semipolar III-nitrides using high resolution X-ray diffraction

    NASA Astrophysics Data System (ADS)

    Frentrup, Martin; Hatui, Nirupam; Wernicke, Tim; Stellmach, Joachim; Bhattacharya, Arnab; Kneissl, Michael

    2013-12-01

    In group-III-nitride heterostructures with semipolar or nonpolar crystal orientation, anisotropic lattice and thermal mismatch with the buffer or substrate lead to a complex distortion of the unit cells, e.g., by shearing of the lattice. This makes an accurate determination of lattice parameters, composition, and strain state under assumption of the hexagonal symmetry impossible. In this work, we present a procedure to accurately determine the lattice constants, strain state, and composition of semipolar heterostructures using high resolution X-ray diffraction. An analysis of the unit cell distortion shows that four independent lattice parameters are sufficient to describe this distortion. Assuming only small deviations from an ideal hexagonal structure, a linear expression for the interplanar distances dhkl is derived. It is used to determine the lattice parameters from high resolution X-ray diffraction 2ϑ-ω-scans of multiple on- and off-axis reflections via a weighted least-square fit. The strain and composition of ternary alloys are then evaluated by transforming the elastic parameters (using Hooke's law) from the natural crystal-fixed coordinate system to a layer-based system, given by the in-plane directions and the growth direction. We illustrate our procedure taking an example of (112¯2) AlκGa1-κN epilayers with Al-contents over the entire composition range. We separately identify the in-plane and out-of-plane strains and discuss origins for the observed anisotropy.

  17. Nanostructure and strain in InGaN/GaN superlattices grown in GaN nanowires

    NASA Astrophysics Data System (ADS)

    Kehagias, Th; Dimitrakopulos, G. P.; Becker, P.; Kioseoglou, J.; Furtmayr, F.; Koukoula, T.; Häusler, I.; Chernikov, A.; Chatterjee, S.; Karakostas, Th; Solowan, H.-M.; Schwarz, U. T.; Eickhoff, M.; Komninou, Ph

    2013-11-01

    The structural properties and the strain state of InGaN/GaN superlattices embedded in GaN nanowires were analyzed as a function of superlattice growth temperature, using complementary transmission electron microscopy techniques supplemented by optical analysis using photoluminescence and spatially resolved microphotoluminescence spectroscopy. A truncated pyramidal shape was observed for the 4 nm thick InGaN inclusions, where their (0 0 0\\bar {1}) central facet was delimited by six-fold {1 0\\bar {1}\\ell } facets towards the m-plane sidewalls of the nanowires. The defect content of the nanowires comprised multiple basal stacking faults localized at the GaN base/superlattice interface, causing the formation of zinc-blende cubic regions, and often single stacking faults at the GaN/InGaN bilayer interfaces. No misfit dislocations or cracks were detected in the heterostructure, implying a fully strained configuration. Geometrical phase analysis showed a rather uniform radial distribution of elastic strain in the (0 0 0\\bar {1}) facet of the InGaN inclusions. Depending on the superlattice growth temperature, the elastic strain energy is partitioned among the successive InGaN/GaN layers in the case of low-temperature growth, while at higher superlattice growth temperature the in-plane tensile misfit strain of the GaN barriers is accommodated through restrained diffusion of indium from the preceding InGaN layers. The corresponding In contents of the central facet were estimated at 0.42 and 0.25, respectively. However, in the latter case, successful reproduction of the experimental electron microscopy images by image simulations was only feasible, allowing for a much higher occupancy of indium adatoms at lattice sites of the semipolar facets, compared to the invariable 25% assigned to the polar facet. Thus, a high complexity in indium incorporation and strain allocation between the different crystallographic facets of the InGaN inclusions is anticipated and supported by

  18. Nanostructure and strain in InGaN/GaN superlattices grown in GaN nanowires.

    PubMed

    Kehagias, Th; Dimitrakopulos, G P; Becker, P; Kioseoglou, J; Furtmayr, F; Koukoula, T; Häusler, I; Chernikov, A; Chatterjee, S; Karakostas, Th; Solowan, H-M; Schwarz, U T; Eickhoff, M; Komninou, Ph

    2013-11-01

    The structural properties and the strain state of InGaN/GaN superlattices embedded in GaN nanowires were analyzed as a function of superlattice growth temperature, using complementary transmission electron microscopy techniques supplemented by optical analysis using photoluminescence and spatially resolved microphotoluminescence spectroscopy. A truncated pyramidal shape was observed for the 4 nm thick InGaN inclusions, where their (0001¯) central facet was delimited by six-fold {101¯l} facets towards the m-plane sidewalls of the nanowires. The defect content of the nanowires comprised multiple basal stacking faults localized at the GaN base/superlattice interface, causing the formation of zinc-blende cubic regions, and often single stacking faults at the GaN/InGaN bilayer interfaces. No misfit dislocations or cracks were detected in the heterostructure, implying a fully strained configuration. Geometrical phase analysis showed a rather uniform radial distribution of elastic strain in the (0001¯) facet of the InGaN inclusions. Depending on the superlattice growth temperature, the elastic strain energy is partitioned among the successive InGaN/GaN layers in the case of low-temperature growth, while at higher superlattice growth temperature the in-plane tensile misfit strain of the GaN barriers is accommodated through restrained diffusion of indium from the preceding InGaN layers. The corresponding In contents of the central facet were estimated at 0.42 and 0.25, respectively. However, in the latter case, successful reproduction of the experimental electron microscopy images by image simulations was only feasible, allowing for a much higher occupancy of indium adatoms at lattice sites of the semipolar facets, compared to the invariable 25% assigned to the polar facet. Thus, a high complexity in indium incorporation and strain allocation between the different crystallographic facets of the InGaN inclusions is anticipated and supported by the results of

  19. Piezotronic Effect in Polarity-Controlled GaN Nanowires.

    PubMed

    Zhao, Zhenfu; Pu, Xiong; Han, Changbao; Du, Chunhua; Li, Linxuan; Jiang, Chunyan; Hu, Weiguo; Wang, Zhong Lin

    2015-08-25

    Using high-quality and polarity-controlled GaN nanowires (NWs), we studied the piezotronic effect in crystal orientation defined wurtzite structures. By applying a normal compressive force on c-plane GaN NWs with an atomic force microscopy tip, the Schottky barrier between the Pt tip and GaN can be effectively tuned by the piezotronic effect. In contrast, the normal compressive force cannot change the electron transport characteristics in m-plane GaN NWs whose piezoelectric polarization axis is turned in the transverse direction. This observation provided solid evidence for clarifying the difference between the piezotronic effect and the piezoresistive effect. We further demonstrated a high sensitivity of the m-plane GaN piezotronic transistor to collect the transverse force. The integration of c-plane GaN and m-plane GaN indicates an overall response to an external force in any direction. PMID:26256533

  20. Experimental evidence of homonuclear bonds in amorphous GaN

    SciTech Connect

    Ishimaru, Dr. Manabu; Zhang, Yanwen; Wang, Xuemei; Chu, Wei-Kan; Weber, William J

    2011-01-01

    Although GaN is an important semiconductor material, its amorphous structures are not well understood. Currently, theoretical atomistic structural models which contradict each other, are proposed for the chemical short-range order of amorphous GaN: one characterizes amorphous GaN networks as highly chemically ordered, consisting of heteronuclear Ga-N atomic bonds; and the other predicts the existence of a large number of homonuclear bonds within the first coordination shell. In the present study, we examine amorphous structures of GaN via radial distribution functions obtained by electron diffraction techniques. The experimental results demonstrate that amorphous GaN networks consist of heterononuclear Ga-N bonds, as well as homonuclear Ga-Ga and N-N bonds.

  1. Epitaxial relationship of semipolar s-plane (1101) InN grown on r-plane sapphire

    SciTech Connect

    Dimitrakopulos, G. P.

    2012-07-02

    The heteroepitaxy of semipolar s-plane (1101) InN grown directly on r-plane sapphire by plasma-assisted molecular beam epitaxy is studied using transmission electron microscopy techniques. The epitaxial relationship is determined to be (1101){sub InN} Parallel-To (1102){sub Al{sub 2O{sub 3}}}, [1120]{sub InN} Parallel-To [2021]{sub Al{sub 2O{sub 3}}}, [1102]{sub InN}{approx} Parallel-To [0221]{sub Al{sub 2O{sub 3}}}, which ensures a 0.7% misfit along [1120]{sub InN}. Two orientation variants are identified. Proposed geometrical factors contributing to the high density of basal stacking faults, partial dislocations, and sphalerite cubic pockets include the misfit accommodation and reduction, as well as the accommodation of lattice twist.

  2. Optical absorption of polar and semipolar InGaN/GaN quantum wells for blue to green converter structures

    SciTech Connect

    Neuschl, B. Helbing, J.; Thonke, K.

    2014-11-14

    The optical absorption of indium gallium nitride (InGaN)/GaN multi quantum wells (QWs) is analyzed theoretically and experimentally. For different sample structures, either planar or three-dimensional, including QWs with different tilts relative to the (0001) plane of the wurtzite crystal, the room temperature absorption spectra were measured. We observe increasing absorption for larger indium content in the active zone and for increasing QW thickness. The semipolar structures with their reduced internal electric field are favorable with respect to the spectral absorption when compared with polar samples. Numerical k ⋅ p based simulations for quantum wells with variable thickness, indium content, and orientation are in accordance with the experimental results. By taking all QW energy eigenstates in all bands as well as the orientation dependent transition probabilities into account, the spectral absorption for arbitrary sample structures can be calculated.

  3. Influence of dislocations on indium diffusion in semi-polar InGaN/GaN heterostructures

    SciTech Connect

    Yin, Yao; Sun, Huabin; Chen, Peng; Sang, Liwen; Dierre, Benjamin; Sumiya, Masatomo; Sekiguchi, Takashi; Zheng, Youdou; Shi, Yi

    2015-05-15

    The spatial distribution of indium composition in InGaN/GaN heterostructure is a critical topic for modulating the wavelength of light emitting diodes. In this letter, semi-polar InGaN/GaN heterostructure stripes were fabricated on patterned GaN/Sapphire substrates by epitaxial lateral overgrowth (ELO), and the spatial distribution of indium composition in the InGaN layer was characterized by using cathodoluminescence. It is found that the indium composition is mainly controlled by the diffusion behaviors of metal atoms (In and Ga) on the surface. The diffusivity of metal atoms decreases sharply as migrating to the region with a high density of dislocations and other defects, which influences the distribution of indium composition evidently. Our work is beneficial for the understanding of ELO process and the further development of InGaN/GaN heterostructure based devices.

  4. X-linked mental retardation with neonatal hypotonia in a French family (MRX15): Gene assignment to Xp11.22-Xp21.1

    SciTech Connect

    Raynaud, M.; Dessay, B.; Ayrault, A.D.

    1996-07-12

    Linkage analysis was performed in a family with non-specific X-linked mental retardation (MRX 15). Hypotonia in infancy was the most remarkable physical manifestation. The severity of mental deficiency was variable among the patients, but all of them had poor or absent speech. Significant lod scores at a recombination fraction of zero were detected with the marker loci DXS1126, DXS255, and DXS573 (Zmax = 2.01) and recombination was observed with the two flanking loci DXS164 (Xp21.1) and DXS988 (Xp11.22), identifying a 17 cM interval. This result suggests a new gene localization in the proximal Xp region. In numerous families with non-specific X-linked mental retardation (MRX), the corresponding gene has been localized to the paracentromeric region in which a low recombination rate impairs the precision of mapping. 58 refs., 3 figs., 5 tabs.

  5. Microstructural dependency of optical properties of m-plane InGaN multiple quantum wells grown on 2° misoriented bulk GaN substrates

    SciTech Connect

    Tang, Fengzai; Barnard, Jonathan S.; Zhu, Tongtong; Oehler, Fabrice; Kappers, Menno J.; Oliver, Rachel A.

    2015-08-24

    A non-polar m-plane structure consisting of five InGaN/GaN quantum wells (QWs) was grown on ammonothermal bulk GaN by metal-organic vapor phase epitaxy. Surface step bunches propagating through the QW stack were found to accommodate the 2° substrate miscut towards the -c direction. Both large steps with heights of a few tens of nanometres and small steps between one and a few atomic layers in height are observed, the former of which exhibit cathodoluminescence at longer wavelengths than the adjacent m-plane terraces. This is attributed to the formation of semi-polar facets at the steps on which the QWs are shown to be thicker and have higher Indium contents than those in the adjacent m-plane regions. Discrete basal-plane stacking faults (BSFs) were occasionally initiated from the QWs on the main m-plane terraces, but groups of BSFs were frequently observed to initiate from those on the large steps, probably related to the increased strain associated with the locally higher indium content and thickness.

  6. Optical properties of m-plane GaN grown on patterned Si(112) substrates by MOCVD using a two-step approach

    NASA Astrophysics Data System (ADS)

    Izyumskaya, N.; Okur, S.; Zhang, F.; Monavarian, M.; Avrutin, V.; Özgür, Ü.; Metzner, S.; Karbaum, C.; Bertram, F.; Christen, J.; Morkoç, H.

    2014-03-01

    Nonpolar m-plane GaN layers were grown on patterned Si (112) substrates by metal-organic chemical vapor deposition (MOCVD). A two-step growth procedure involving a low-pressure (30 Torr) first step to ensure formation of the m-plane facet and a high-pressure step (200 Torr) for improvement of optical quality was employed. The layers grown in two steps show improvement of the optical quality: the near-bandedge photoluminescence (PL) intensity is about 3 times higher than that for the layers grown at low pressure, and deep emission is considerably weaker. However, emission intensity from m-GaN is still lower than that of polar and semipolar (1 100 ) reference samples grown under the same conditions. To shed light on this problem, spatial distribution of optical emission over the c+ and c- wings of the nonpolar GaN/Si was studied by spatially resolved cathodoluminescence and near-field scanning optical microscopy.

  7. Microstructural dependency of optical properties of m-plane InGaN multiple quantum wells grown on 2° misoriented bulk GaN substrates

    NASA Astrophysics Data System (ADS)

    Tang, Fengzai; Barnard, Jonathan S.; Zhu, Tongtong; Oehler, Fabrice; Kappers, Menno J.; Oliver, Rachel A.

    2015-08-01

    A non-polar m-plane structure consisting of five InGaN/GaN quantum wells (QWs) was grown on ammonothermal bulk GaN by metal-organic vapor phase epitaxy. Surface step bunches propagating through the QW stack were found to accommodate the 2° substrate miscut towards the -c direction. Both large steps with heights of a few tens of nanometres and small steps between one and a few atomic layers in height are observed, the former of which exhibit cathodoluminescence at longer wavelengths than the adjacent m-plane terraces. This is attributed to the formation of semi-polar facets at the steps on which the QWs are shown to be thicker and have higher Indium contents than those in the adjacent m-plane regions. Discrete basal-plane stacking faults (BSFs) were occasionally initiated from the QWs on the main m-plane terraces, but groups of BSFs were frequently observed to initiate from those on the large steps, probably related to the increased strain associated with the locally higher indium content and thickness.

  8. Phenotype-genotype correlations in 17 new patients with an Xp11.23p11.22 microduplication and review of the literature.

    PubMed

    Nizon, Mathilde; Andrieux, Joris; Rooryck, Caroline; de Blois, Marie-Christine; Bourel-Ponchel, Emilie; Bourgois, Béatrice; Boute, Odile; David, Albert; Delobel, Bruno; Duban-Bedu, Bénédicte; Giuliano, Fabienne; Goldenberg, Alice; Grotto, Sarah; Héron, Delphine; Karmous-Benailly, Houda; Keren, Boris; Lacombe, Didier; Lapierre, Jean-Michel; Le Caignec, Cédric; Le Galloudec, Eric; Le Merrer, Martine; Le Moing, Anne-Gaëlle; Mathieu-Dramard, Michèle; Nusbaum, Sylvie; Pichon, Olivier; Pinson, Lucile; Raoul, Odile; Rio, Marlène; Romana, Serge; Roubertie, Agnès; Colleaux, Laurence; Turleau, Catherine; Vekemans, Michel; Nabbout, Rima; Malan, Valérie

    2015-01-01

    Array comparative genomic hybridization (array CGH) has proven its utility in uncovering cryptic rearrangements in patients with X-linked intellectual disability. In 2009, Giorda et al. identified inherited and de novo recurrent Xp11.23p11.22 microduplications in two males and six females from a wide cohort of patients presenting with syndromic intellectual disability. To date, 14 females and 5 males with an overlapping microduplication have been reported in the literature. To further characterize this emerging syndrome, we collected clinical and microarray data from 17 new patients, 10 females, and 7 males. The Xp11.23p11.2 microduplications detected by array CGH ranged in size from 331 Kb to 8.9 Mb. Five patients harbored 4.5 Mb recurrent duplications mediated by non-allelic homologous recombination between segmental duplications and 12 harbored atypical duplications. The chromosomal rearrangement occurred de novo in eight patients and was inherited in six affected males from three families. Patients shared several common major characteristics including moderate to severe intellectual disability, early onset of puberty, language impairment, and age related epileptic syndromes such as West syndrome and focal epilepsy with activation during sleep evolving in some patients to continuous spikes-and-waves during slow sleep. Atypical microduplications allowed us to identify minimal critical regions that might be responsible for specific clinical findings of the syndrome and to suggest possible candidate genes: FTSJ1 and SHROOM4 for intellectual disability along with PQBP1 and SLC35A2 for epilepsy. Xp11.23p11.22 microduplication is a recently-recognized syndrome associated with intellectual disability, epilepsy, and early onset of puberty in females. In this study, we propose several genes that could contribute to the phenotype. PMID:25425167

  9. Defects in semipolar (1122) ZnO grown on (112) LaAlO3/(La,Sr)(Al,Ta)O3 substrate by pulsed laser deposition.

    PubMed

    Tian, Jr-Sheng; Wu, Yue-Han; Peng, Chun-Yen; Chiu, Kun-An; Shih, Yi-Sen; Do, Hien; Lin, Pei-Yin; Ho, Yen-Teng; Chu, Ying-Hao; Chang, Li

    2013-03-27

    The microstructure of semipolar [Formula: see text] ZnO deposited on (112) LaAlO3/(La,Sr)(Al,Ta)O3 was investigated by transmission electron microscopy. The ZnO shows an in-plane epitaxial relationship of [Formula: see text] with oxygen-face sense polarity. The misfit strain along [Formula: see text] and [Formula: see text] is relieved through the formation of misfit dislocations with the Burgers vectors [Formula: see text] and [Formula: see text], respectively. The line defects in the semipolar ZnO are predominantly perfect dislocations, and the dislocation density decreases with increasing ZnO thickness as a result of dislocation reactions. Planar defects were observed to lie in the M-plane and extend along 〈0001〉, whereas basal stacking faults were rarely found. PMID:23449009

  10. Nanoscale anisotropic plastic deformation in single crystal GaN

    PubMed Central

    2012-01-01

    Elasto-plastic mechanical deformation behaviors of c-plane (0001) and nonpolar GaN single crystals are studied using nanoindentation, cathodoluminescence, and transmission electron microscopy. Nanoindentation tests show that c-plane GaN is less susceptible to plastic deformation and has higher hardness and Young's modulus than the nonpolar GaN. Cathodoluminescence and transmission electron microscopy characterizations of indent-induced plastic deformation reveal that there are two primary slip systems for the c-plane GaN, while there is only one most favorable slip system for the nonplane GaN. We suggest that the anisotropic elasto-plastic mechanical properties of GaN are relative to its anisotropic plastic deformation behavior. PACS: 62.20.fq; 81.05.Ea; 61.72.Lk. PMID:22353389

  11. Testing models of thorium and particle cycling in the ocean using data from station GT11-22 of the U.S. GEOTRACES North Atlantic section

    NASA Astrophysics Data System (ADS)

    Lerner, Paul; Marchal, Olivier; Lam, Phoebe J.; Anderson, Robert F.; Buesseler, Ken; Charette, Matthew A.; Edwards, R. Lawrence; Hayes, Christopher T.; Huang, Kuo-Fang; Lu, Yanbin; Robinson, Laura F.; Solow, Andrew

    2016-07-01

    Thorium is a highly particle-reactive element that possesses different measurable radio-isotopes in seawater, with well-constrained production rates and very distinct half-lives. As a result, Th has emerged as a key tracer for the cycling of marine particles and of their chemical constituents, including particulate organic carbon. Here two different versions of a model of Th and particle cycling in the ocean are tested using an unprecedented data set from station GT11-22 of the U.S. GEOTRACES North Atlantic Section: (i) 228,230,234Th activities of dissolved and particulate fractions, (ii) 228Ra activities, (iii) 234,238U activities estimated from salinity data and an assumed 234U/238U ratio, and (iv) particle concentrations, below a depth of 125 m. The two model versions assume a single class of particles but rely on different assumptions about the rate parameters for sorption reactions and particle processes: a first version (V1) assumes vertically uniform parameters (a popular description), whereas the second (V2) does not. Both versions are tested by fitting to the GT11-22 data using generalized nonlinear least squares and by analyzing residuals normalized to the data errors. We find that model V2 displays a significantly better fit to the data than model V1. Thus, the mere allowance of vertical variations in the rate parameters can lead to a significantly better fit to the data, without the need to modify the structure or add any new processes to the model. To understand how the better fit is achieved we consider two parameters, K =k1 /(k-1 +β-1) and K/P, where k1 is the adsorption rate constant, k-1 the desorption rate constant, β-1 the remineralization rate constant, and P the particle concentration. We find that the rate constant ratio K is large (⩾ 0.2) in the upper 1000 m and decreases to a nearly uniform value of ca. 0.12 below 2000 m, implying that the specific rate at which Th attaches to particles relative to that at which it is released from

  12. Transfer characteristics in a GaN MFSFET: comparison with a conventional GaN MOSFET

    NASA Astrophysics Data System (ADS)

    Ran, Jinzhi; Ying, Wei; Cai, Xueyuan; Yang, Jianhong

    2012-07-01

    Based on the Miller model, we develop an analytical model for the GaN-based metal-ferroelectric-semiconductor field-effect transistors (MFSFETs). In this article, we investigate the effects of ferroelectric film on the maximum drain current, transconductance and memory window of GaN MFSFET at the different hierarchical thickness values of 10, 30, 50, 100, 200 and 300 nm, as well as the polarisation influence. The results indicate that the thickness of ferroelectric film is one of the critical parameters, and certain trade-off should be made for various potential applications. Moreover, the advantages of GaN MFSFET are also investigated in detail, compared with the conventional GaN metal-oxide-semiconductor field-effect transistor under the conditions of similar design. Our results of simulation shows that GaN MFSFETs hold the numerous advantages in electrical characteristics, such as the maximal drain current reaching 69 mA, and the threshold voltage and the subthreshold slope as low as 1.5 V and 58 mV/decade, respectively. In general, these theoretical predictions not only indicate that GaN MFSFET devices have wide applicational perspectives, but also they provide some important references to the empirical research and the design of new electron devices in the future.

  13. GaN substrate and GaN homo-epitaxy for LEDs: Progress and challenges

    NASA Astrophysics Data System (ADS)

    Wu, Jie-Jun; Wang, Kun; Yu, Tong-Jun; Zhang, Guo-Yi

    2015-06-01

    After a brief review on the progresses in GaN substrates by ammonothermal method and Na-flux method and hydride vapor phase epitaxy (HVPE) technology, our research results of growing GaN thick layer by a gas flow-modulated HVPE, removing the GaN layer through an efficient self-separation process from sapphire substrate, and modifying the uniformity of multiple wafer growth are presented. The effects of surface morphology and defect behaviors on the GaN homo-epitaxial growth on free standing substrate are also discussed, and followed by the advances of LEDs on GaN substrates and prospects of their applications in solid state lighting. Project supported by the National High Technology Research and Development Program of China (Grant No. 2014AA032605), the National Key Basic Research and Development Program of China (Grant Nos. 2012CB619304 and 2011CB301904), and the National Natural Science Foundation of China (Grant Nos. 61376012, 61474003, and 61327801).

  14. Self-catalyzed anisotropic growth of GaN spirals

    NASA Astrophysics Data System (ADS)

    Patsha, Avinash; Sahoo, Prasana; Dhara, S.; Tyagi, A. K.

    2012-06-01

    GaN spirals with homogeneous size are grown using chemical-vapor-deposition technique in a self catalytic process. Raman and photoluminescence (PL) studies reveal wurtzite GaN phase. Nucleation of GaN sphere takes place with the agglomeration Ga clusters and simultaneous reaction with NH3. A growth mechanism involving diffusion limited aggregation process initiating supersaturation and subsequent neck formation along with possible role of thermodynamic fluctuation in different crystalline facets of GaN, is described for the anisotropic spiral structures. Temperature dependent PL spectra show strong excitonic emissions along with the presence of free-to-bound transition.

  15. Molecular localization of the t(11; 22)(q24; q12) translocation of Ewing sarcoma by chromosomal in situ suppression hybridization

    SciTech Connect

    Selleri, L.; Hermanson, G.G.; Eubanks, J.H.; Lewis, K.A.; Evans, G.A. )

    1991-02-01

    Chromosome translocations are associated with a variety of human leukemias, lymphomas, and solid tumors. To localize molecular markers flanking the t(11;22)(q24;q12) breakpoint that occurs in virtually all cases of Ewing sarcoma and peripheral neuroepithelioma, high-resolution chromosomal in situ suppression hybridization was carried out using a panel of cosmid clones localized and ordered on chromosome 11q. The location of the Ewing sarcoma translocation breakpoint was determined relative to the nearest two cosmid markers on 11q, clones 23.2 and 5.8, through the analysis of metaphase chromosome hybridization. By in situ hybridization to interphase nuclei, the approximate physical separation of these two markers was determined. In both Ewing sarcoma and peripheral neuroepithelioma, cosmid clone 5.8 is translocated from chromosome 11q24 to the derivative chromosome 22 and a portion of chromosome 22q12 carrying the leukemia inhibitory factor gene is translocated to the derivative chromosome 11. The physical distance between the flanking cosmid markers on chromosome 11 was determined to be in the range of 1,000 kilobases, and genomic analysis using pulsed-field gel electrophoresis showed no abnormalities over a region of 650 kilobases in the vicinity of the leukemia inhibitory factor gene on chromosome 22. This approach localizes the Ewing sarcoma breakpoint to a small region on chromosome 11q24 and provides a rapid and precise technique for the molecular characterization of chromosomal aberrations.

  16. Lambert-Eaton myasthenic syndrome in a 13-year-old girl with Xp11.22-p11.23 duplication.

    PubMed

    Verbeek, Sabine; Vanakker, Olivier; Mercelis, Rudy; Lipka, A F; Haerynck, Filomeen; Dullaers, Melissa; Verloo, Patrick; Van Coster, Rudy; Verhelst, Helene

    2014-05-01

    Lambert-Eaton myasthenic syndrome (LEMS) is an autoimmune disease of the presynaptic neuromuscular junction, typically occurring in adults as a paraneoplastic syndrome. Only rare cases have been reported in childhood. In most childhood cases, malignancies have not been detected but a propensity to autoimmune disease was noticed. Nevertheless, little is known about genetic factors that may contribute to the susceptibility of an individual to develop LEMS. We report on a 13-year-old girl, known with the Xp11.22-p11.23 duplication syndrome, who presented with severe non-paraneoplastic LEMS. The potential role of this microduplication syndrome in the development of LEMS is explored. Previous literature review of twelve Xp11.2 duplication syndrome patients showed that three of them suffered from various autoimmune diseases. The common duplicated region in those three patients and the presented case comprises 12 disease-associated genes including the FOXP3 (Forkhead Box P3) and WAS (Wiskott-Aldrich syndrome) gene, both implicated in immune function. However, it is unclear whether increased gene dosage of one or both of these genes can cause susceptibility to autoimmune diseases. In conclusion, the presented case emphasizes that autoimmune disease is a recurrent feature of the Xp11.2 duplication syndrome, which should be considered in the follow-up of these patients. The exact mechanism underlying this autoimmune propensity remains to be elucidated. PMID:24461257

  17. Dislocation core in GaN

    SciTech Connect

    Liliental-Weber, Zuzanna; Jasinski, Jacek B.; Washburn, Jack; O'Keefe, Michael A.

    2002-02-20

    Light emitting diodes and blue laser diodes grown on GaN have been demonstrated despite six orders of magnitude higher dislocation density than that for III-V arsenide and phosphide diodes. Understanding and determination of dislocation cores in GaN is crucial since both theoretical and experimental work are somewhat contradictory. Transmission Electron Microscopy (TEM) has been applied to study the layers grown by hydride vapor-phase epitaxy (HVPE) and molecular beam epitaxy (MBE) (under Ga rich conditions) in plan-view and cross-section samples. This study suggests that despite the fact that voids are formed along the dislocation line in HVPE material, the dislocations have closed cores. Similar results of closed core are obtained for the screw dislocation in the MBE material, confirming earlier studies.

  18. Amphoteric arsenic in GaN

    SciTech Connect

    Wahl, U.; Correia, J. G.; Araujo, J. P.; Rita, E.; Soares, J. C.

    2007-04-30

    The authors have determined the lattice location of implanted arsenic in GaN by means of conversion electron emission channeling from radioactive {sup 73}As. They give direct evidence that As is an amphoteric impurity, thus settling the long-standing question as to whether it prefers cation or anion sites in GaN. The amphoteric character of As and the fact that As{sub Ga} 'antisites' are not minority defects provide additional aspects to be taken into account for an explanantion of the so-called miscibility gap in ternary GaAs{sub 1-x}N{sub x} compounds, which cannot be grown with a single phase for values of x in the range of 0.1

  19. TEM characterization of GaN nanowires

    SciTech Connect

    Liliental-Weber, Zuzanna; Gao, Y.H.; Bando, Y.

    2002-02-21

    Transmission electron microscopy was applied to study GaN nanowires grown on carbon nanotube surfaces by chemical reaction between Ga{sub 2}O and NH{sub 3} gas in a conventional furnace. These wires grew in two crystallographic directions, <2{und 11}0> and <01{und 1}0> (fast growth directions of GaN), in the form of whiskers covered by small elongated GaN platelets. The morphology of these platelets is similar to that observed during the growth of single crystals from a Ga melt at high temperatures under high nitrogen pressure. It is thought that growth of nanowires in two different crystallographic directions and the arrangement of the platelets to the central whisker may be influenced by the presence of Ga{sub 2}O{sub 3} (based on the observation of the energy dispersive x-ray spectra), the interplanar spacings in the wire, and the presence of defects on the interface between the central part of the nanowire and the platelets surrounding it.

  20. Built-in electric field and radiative efficiency of polar (0001) and semipolar (11–22) Al{sub 0.5}Ga{sub 0.5}N/GaN quantum dots

    SciTech Connect

    Brault, J.; Kahouli, A.; Leroux, M.; Damilano, B.; Elmaghraoui, D.; Vennéguès, P.; Guillet, T.; Brimont, C.

    2013-12-04

    We compare the optical properties of ensembles of polar (0001) and semipolar (11–22) Al{sub 0.5}Ga{sub 0.5}N/GaN quantum dots grown by molecular beam epitaxy The polar quantum dot emission shows a huge Stark shift. Using dot height distributions measured by transmission electron microscopy, a simple model allows accounting for the PL energies and lineshapes, and to the screening of the Stark field. The semipolar quantum dots emission show a much weaker Stark effect. High room temperature quantum yields attest the efficiency of 3D-confinement.

  1. Calibration of the Chemcatcher passive sampler for monitoring selected polar and semi-polar pesticides in surface water.

    PubMed

    Gunold, Roman; Schäfer, Ralf Bernhard; Paschke, Albrecht; Schüürmann, Gerrit; Liess, Matthias

    2008-09-01

    Passive sampling is a powerful method for continuous pollution monitoring, but calibration experiments are still needed to generate sampling rates in order to estimate water concentrations for polar compounds. We calibrated the Chemcatcher device with an uncovered SDB-XC Empore disk as receiving phase for 12 polar and semi-polar pesticides in aquatic environments in flow-through tank experiments at two water flow velocities (0.135 m/s and 0.4 m/s). In the 14-day period of exposure the uptake of test substances in the sampler remained linear, and all derived sampling rates R(s) were in the range of 0.1 to 0.5 L/day. By additionally monitoring the release of two preloaded polar pesticides from the SDB-XC disks over time, very high variation in release kinetics was found, which calls into question the applicability of performance reference compounds. Our study expands the applicability of the Chemcatcher for monitoring trace concentrations of pesticides with frequent occurrence in water. PMID:18068881

  2. The human DENN gene: genomic organization, alternative splicing, and localization to chromosome 11p11.21-p11.22.

    PubMed

    Chow, V T; Lim, K M; Lim, D

    1998-08-01

    We have previously isolated and sequenced the cDNA of a novel gene, DENN, that exhibits differential mRNA expression in normal and neoplastic cells. The open reading frame of 4761 nucleotides encodes a putative hydrophilic protein of 1587 amino acids with a calculated molecular mass of 176,431 Da. Within DENN cDNA lies an alternative exon segment of 129 nucleotides encoding 43 amino acids, which may be excluded from some transcripts by alternative splicing. The serine- and leucine-rich DENN protein possesses a RGD cellular adhesion motif and a leucine-zipper-like motif associated with protein dimerization, and shows partial homology to the receptor binding domain of tumor necrosis factor alpha. DENN is virtually identical to MADD, a human MAP kinase-activating death domain protein that interacts with type I tumor necrosis factor receptor. DENN displays significant homology to Rab3 GEP, a rat GDP/GTP exchange protein specific for Rab3 small G proteins implicated in intracellular vesicle trafficking. DENN also exhibits strong similarity to Caenorhabditis elegans AEX-3, which interacts with Rab3 to regulate synaptic vesicle release. Composed of 15 exons (ranging in size from 73 to 1230 bp) and 14 introns (varying from about 170 bp to 5.3 kb), the DENN gene is estimated to span at least 28 kb. The alternative splicing event was traced to an alternative 5' donor site involving exon 7. DENN was mapped to chromosome region 11p11.21-p11.22 by FISH. Using polyclonal antibodies against a synthetic peptide, Western blotting of MOLT-4 T-lymphoblastic leukemic cell proteins and immunoblotting of subcellular fractions of MOLT-4 cells and PLC/PRF/5 liver cancer cells yielded data corroborating the alternative splicing mechanism that generates two variant isoforms of the DENN protein that display differential expression in cells of different lineages. PMID:9796103

  3. P-type doping of GaN

    SciTech Connect

    Wong, R.K.

    2000-04-10

    After implantation of As, As + Be, and As + Ga into GaN and annealing for short durations at temperatures as high as 1500 C, the GaN films remained highly resistive. It was apparent from c-RBS studies that although implantation damage did not create an amorphous layer in the GaN film, annealing at 1500 C did not provide enough energy to completely recover the radiation damage. Disorder recovered significantly after annealing at temperatures up to 1500 C, but not completely. From SIMS analysis, oxygen contamination in the AIN capping layer causes oxygen diffusion into the GaN film above 1400 C. The sapphire substrate (A1203) also decomposed and oxygen penetrated into the backside of the GaN layer above 1400 C. To prevent donor-like oxygen impurities from the capping layer and the substrate from contaminating the GaN film and compensating acceptors, post-implantation annealing should be done at temperatures below 1500 C. Oxygen in the cap could be reduced by growing the AIN cap on the GaN layer after the GaN growth run or by depositing the AIN layer in a ultra high vacuum (UHV) system post-growth to minimize residual oxygen and water contamination. With longer annealing times at 1400 C or at higher temperatures with a higher quality AIN, the implantation drainage may fully recover.

  4. GaN Electronics For High Power, High Temperature Applications

    SciTech Connect

    PEARTON,S.J.; REN,F.; ZHANG,A.P.; DANG,G.; CAO,X.A.; LEE,K.P.; CHO,H.; GILA,B.P.; JOHNSON,J.W.; MONIER,C.; ABERNATHY,C.R.; HAN,JUNG; BACA,ALBERT G.; CHYI,J.-I.; LEE,C.-M.; NEE,T.-E.; CHUO,C.-C.; CHU,S.N.G.

    2000-06-12

    A brief review is given of recent progress in fabrication of high voltage GaN and AlGaN rectifiers. GaN/AlGaN heterojunction bipolar transistors and GaN metal-oxide semiconductor field effect transistors. Improvements in epitaxial layer quality and in fabrication techniques have led to significant advances in device performance.

  5. Implant activation and redistribution of dopants in GaN

    SciTech Connect

    Zolper, J.C.; Pearton, S.J.; Wilson, R.G.; Stall, R.A.

    1996-07-01

    GaN and related III-Nitride materials (IN, an) have recently been the focus of extensive research for photonic and electronic device applications. As this material system matures, ion implantation doping and isolation is expected to play an important role in advance device demonstrations. To this end, we report the demonstration of implanted p-type doping with Mg+P and Ca as well as n-type doping with Si in GaN. These implanted dopants require annealing 105 approximately1100 {degrees}C to achieve electrical activity, but demonstrate limited redistribution at this temperature. The redistribution of other potential dopants in GaN (such as Be, Zn, and Cd) will also be reported. Results for a GaN junction field effect transistor (JFET), the first GaN device to use implantation doping, will also be presented.

  6. Atomic force microscopy studies of homoepitaxial GaN layers grown on GaN template by laser MBE

    NASA Astrophysics Data System (ADS)

    Choudhary, B. S.; Singh, A.; Tanwar, S.; Tyagi, P. K.; Kumar, M. Senthil; Kushvaha, S. S.

    2016-04-01

    We have grown homoepitaxial GaN films on metal organic chemical vapor deposition (MOCVD) grown 3.5 µm thick GaN on sapphire (0001) substrate (GaN template) using an ultra-high vacuum (UHV) laser assisted molecular beam epitaxy (LMBE) system. The GaN films were grown by laser ablating a polycrystalline solid GaN target in the presence of active r.f. nitrogen plasma. The influence of laser repetition rates (10-30 Hz) on the surface morphology of homoepitaxial GaN layers have been studied using atomic force microscopy. It was found that GaN layer grown at 10 Hz shows a smooth surface with uniform grain size compared to the rough surface with irregular shape grains obtained at 30 Hz. The variation of surface roughness of the homoepitaxial GaN layer with and without wet chemical etching has been also studied and it was observed that the roughness of the film decreased after wet etching due to the curved structure/rough surface.

  7. Carrier redistribution between different potential sites in semipolar (202{sup ¯}1) InGaN quantum wells studied by near-field photoluminescence

    SciTech Connect

    Marcinkevičius, S.; Gelžinytė, K.; Zhao, Y.; Nakamura, S.; DenBaars, S. P.; Speck, J. S.

    2014-09-15

    Scanning near-field photoluminescence (PL) spectroscopy at different excitation powers was applied to study nanoscale properties of carrier localization and recombination in semipolar (202{sup ¯}1) InGaN quantum wells (QWs) emitting in violet, blue, and green-yellow spectral regions. With increased excitation power, an untypical PL peak energy shift to lower energies was observed. The shift was attributed to carrier density dependent carrier redistribution between nm-scale sites of different potentials. Near-field PL scans showed that in (202{sup ¯}1) QWs the in-plane carrier diffusion is modest, and the recombination properties are uniform, which is advantageous for photonic applications.

  8. Direct MOVPE growth of semipolar (11 2 bar 2) AlxGa1-xN across the alloy composition range

    NASA Astrophysics Data System (ADS)

    Hatui, Nirupam; Rahman, A. Azizur; Maliakkal, Carina B.; Bhattacharya, Arnab

    2016-03-01

    We report a simple direct route for the synthesis of high-quality semipolar (11 2 bar 2) AlGaN alloys across the composition range by metalorganic vapour phase epitaxy. We show that a single high-temperature growth step without the use of a low-temperature nucleation or buffer layer is a convenient way to grow high-quality (11 2 bar 2) AlGaN layers on m-plane sapphire substrate. We also report a detailed investigation of the microstructure and optical properties of these layers including phase-purity, surface morphology, epilayer tilt, and polarization-resolved optical transmission measurements.

  9. GaN: Defect and Device Issues

    SciTech Connect

    Pearton, S.J.; Ren, F.; Shul, R.J.; Zolper, J.C.

    1998-11-09

    The role of extended and point defects, and key impurities such as C, O and H, on the electrical and optical properties of GaN is reviewed. Recent progress in the development of high reliability contacts, thermal processing, dry and wet etching techniques, implantation doping and isolation and gate insulator technology is detailed. Finally, the performance of GaN-based electronic and photonic devices such as field effect transistors, UV detectors, laser diodes and light-emitting diodes is covered, along with the influence of process-induced or grown-in defects and impurities on the device physics.

  10. Semipolar polycyclic aromatic compounds: identification of 15 priority substances and the need for regulatory steps under REACH regulation.

    PubMed

    Schwarz, Markus A; Behnke, Andreas; Brandt, Marc; Eisenträger, Adolf; Hassauer, Martin; Kalberlah, Fritz; Seidel, Albrecht

    2014-07-01

    Semipolar polycyclic aromatic compounds (sPACs) are frequently found in association with homocyclic polycyclic aromatic hydrocarbons (PAHs) in substances of unknown or variable composition, complex reaction products, or biological materials (UVCBs) from coal or crude oil and products derived thereof. However, major information deficiencies exist with regard to their prevalence and their toxicological and ecotoxicological potential, persistency, and bioaccumulation characteristics. Therefore, in this work, the environmental concern and relevance of sPACs was addressed in a general, stepwise approach. First, a large list of sPACs was collected and subsequently refined by assessing their persistence, bioaccumulation, and toxicity (PBT) properties by quantitative structure-activity relationship (QSAR) methods and their relevance by determining their respective frequency of occurrence. In this way, 15 priority sPACs were identified. These 15 priority sPACs were further characterized in detail with respect to their ecotoxicological properties, environmental behavior, carcinogenicity, and genotoxicity attributes. All of these 15 substances were quantified in distillate or product samples. In the next step, some principles for nomination of indicator substances, indicative for the overall content of sPACs, are derived. Data gaps on ecotoxicological endpoints preclude final conclusions, but the respective necessary supplemental tests were identified. Five of the 15 sPACs were tentatively characterized as potential substances of very high concern (SVHC) for the environment. The overall results of this study also clearly show that regulatory risk management of homocyclic PAHs within the European Regulation on Registration, Evaluation, Authorisation and Restriction of Chemicals (REACH) does not address the environmental concern created by sPACs within UVCBs from coal or crude oil. The study proves the need for additional regulatory steps under REACH and suggests indicator

  11. Inductively coupled plasma etching of GaN

    SciTech Connect

    Shul, R.J.; McClellan, G.B.; Casalnuovo, S.A.; Rieger, D.J.; Pearton, S.J.; Constantine, C.; Barratt, C.; Karlicek, R.F. Jr.; Tran, C.; Schurman, M.

    1996-08-01

    Inductively coupled plasma (ICP) etch rates for GaN are reported as a function of plasma pressure, plasma chemistry, rf power, and ICP power. Using a Cl{sub 2}/H{sub 2}/Ar plasma chemistry, GaN etch rates as high as 6875 A/min are reported. The GaN surface morphology remains smooth over a wide range of plasma conditions as quantified using atomic force microscopy. Several etch conditions yield highly anisotropic profiles with smooth sidewalls. These results have direct application to the fabrication of group-III nitride etched laser facets. {copyright} {ital 1996 American Institute of Physics.}

  12. Screw dislocations in GaN

    SciTech Connect

    Liliental-Weber, Zuzanna; Jasinski, Jacek B.; Washburn, Jack; O'Keefe, Michael A.

    2002-02-15

    GaN has received much attention over the past few years because of several new applications, including light emitting diodes, blue laser diodes and high-power microwave transistors. One of the biggest problems is a high density of structural defects, mostly dislocations, due to a lack of a suitable lattice-matched substrate since bulk GaN is difficult to grow in large sizes. Transmission Electron Microscopy (TEM) has been applied to study defects in plan-view and cross-sections on samples prepared by conventional techniques such as mechanical thinning and precision ion milling. The density of dislocations close to the sample surface of a 1 mm-thick HVPE sample was in the range of 3x109 cm-2. All three types of dislocations were present in these samples, and almost 50 percent were screw dislocations. Our studies suggest that the core structure of screw dislocations in the same material might differ when the material is grown by different methods.

  13. Longitudinal Excitons in GaN

    NASA Astrophysics Data System (ADS)

    Reynolds, D. C.; Jogai, B.; Collins, T. C.

    2002-05-01

    Many of the previous investigations of longitudinal excitons have involved reflection and absorption measurements rather than emission. In these measurements it is more difficult to resolve the longitudinal exciton from the Γ5 and Γ6 free excitons in wurtzite material. The longitudinal excitons have energies and oscillator strengths that depend on the direction of propagation and they are not observable along the principal axis of the crystal. In the wurtzite structure, such as GaN, the Γ5 exciton is the pure transverse mode, whereas the longitudinal is a mixed mode going from pure longitudinal, for the propogation direction K perpendicular to C, to pure transverse for K parallel to C. If more than one orientation is present in the sample, it is clear that more than one longitudinal exciton may be seen since it is a mixed mode. In the current experiment we observe more than one mode, which we associate with more than one crystal orientation. This may result from the columnar growth often observed in GaN.

  14. GaN for LED applications

    NASA Technical Reports Server (NTRS)

    Pankove, J. I.

    1973-01-01

    In order to improve the synthesis of GaN the effect of various growth and doping parameters has been studied. Although Be, Li, Mg, and Dy can be used to overcompensate native donors, the most interesting acceptor element is Zn. The emission spectrum and the luminescence efficiency depend on the growth temperature (below 800 C), on the partial pressure of the doping impurity, and on the duration of growth. Blue-green electroluminescence with a power efficiency of 0.1 percent and a brightness of 850 fL (at 0.6 mA and 22.5 V) was obtained. Some diodes allow the color of the emitted light to change by reversing the polarity of the bias. Continuous operation of a diode over a period of 5 months showed no evidence of degradation. The luminescence properties of ion-implanted GaN were studied. Delay effects were found in the electroluminescence of diodes, although, with a dc bias, a 70-MHz modulation was possible.

  15. Nucleation and growth of (10¯11) semi-polar AlN on (0001) AlN by Hydride Vapor Phase Epitaxy

    PubMed Central

    Liu, Ting; Zhang, Jicai; Su, Xujun; Huang, Jun; Wang, Jianfeng; Xu, Ke

    2016-01-01

    Wurtzite AlN is widely used for deep ultraviolet optoelectronic devices (DUV), which are generally grown along the [0001]-direction of the wurtzite structure on currently available substrates. However, huge internal electrostatic fields are presented within the material along [0001] axis induced by piezoelectric and spontaneous polarization, which has limited the internal quantum efficiency of AlN based DUV LEDs dramatically. The internal fields can be strongly reduced by changing the epitaxial growth direction from the conventional polar c-direction into less polar crystal directions. Twinned crystal is a crystal consisting of two or more domains with the same crystal lattice and composition but different crystal orientations. In other words, twins can be induced to change crystal directions. In this work we demonstrated that the epitaxial growth of () semi-polar AlN on (0001) AlN by constructing () and () twin structures. This new method is relative feasible than conventional methods and it has huge prospect to develop high-quality semi-polar AlN. PMID:27185345

  16. Nucleation and growth of (10͞11) semi-polar AlN on (0001) AlN by Hydride Vapor Phase Epitaxy

    NASA Astrophysics Data System (ADS)

    Liu, Ting; Zhang, Jicai; Su, Xujun; Huang, Jun; Wang, Jianfeng; Xu, Ke

    2016-05-01

    Wurtzite AlN is widely used for deep ultraviolet optoelectronic devices (DUV), which are generally grown along the [0001]-direction of the wurtzite structure on currently available substrates. However, huge internal electrostatic fields are presented within the material along [0001] axis induced by piezoelectric and spontaneous polarization, which has limited the internal quantum efficiency of AlN based DUV LEDs dramatically. The internal fields can be strongly reduced by changing the epitaxial growth direction from the conventional polar c-direction into less polar crystal directions. Twinned crystal is a crystal consisting of two or more domains with the same crystal lattice and composition but different crystal orientations. In other words, twins can be induced to change crystal directions. In this work we demonstrated that the epitaxial growth of () semi-polar AlN on (0001) AlN by constructing () and () twin structures. This new method is relative feasible than conventional methods and it has huge prospect to develop high-quality semi-polar AlN.

  17. MOVPE growth of semipolar (11 2 bar 2) Al1-xInx N across the alloy composition range (0 ≤ x ≤ 0.55)

    NASA Astrophysics Data System (ADS)

    Hatui, Nirupam; Frentrup, Martin; Rahman, A. Azizur; Kadir, Abdul; Subramanian, Shruti; Kneissl, Michael; Bhattacharya, Arnab

    2015-02-01

    We report the synthesis and characterization of semipolar (11 2 bar 2) oriented Al1-xInxN alloys over a wide composition range (0 ≤ x ≤ 0.55) using metalorganic vapour phase epitaxy (MOVPE) in a close-coupled showerhead reactor system. AlInN layers were deposited on AlN buffer layers on m-plane (10 1 bar 0) sapphire substrates using trimethylaluminium (TMAl), trimethylindium (TMIn), and ammonia (NH3) precursors and the alloy composition tuned by changing the growth temperature from 860°C to 625°C, corresponding to an indium content from 2.9% to 54.6%. High resolution X-ray diffraction (HRXRD) measurements were used to determine the microstructure and anisotropic biaxial strain arising from the intrinsic tricilinic distortion of the unit cell in semipolar nitrides. The epilayers exhibit an overall tilt about the [ 1 1 bar 00 ] direction and phase separation was observed for samples with indium content over 40%. The ternary alloy compositions evaluated from HRXRD were compared with those obtained from optical transmission measurements.

  18. Nucleation and growth of (10͞11) semi-polar AlN on (0001) AlN by Hydride Vapor Phase Epitaxy.

    PubMed

    Liu, Ting; Zhang, Jicai; Su, Xujun; Huang, Jun; Wang, Jianfeng; Xu, Ke

    2016-01-01

    Wurtzite AlN is widely used for deep ultraviolet optoelectronic devices (DUV), which are generally grown along the [0001]-direction of the wurtzite structure on currently available substrates. However, huge internal electrostatic fields are presented within the material along [0001] axis induced by piezoelectric and spontaneous polarization, which has limited the internal quantum efficiency of AlN based DUV LEDs dramatically. The internal fields can be strongly reduced by changing the epitaxial growth direction from the conventional polar c-direction into less polar crystal directions. Twinned crystal is a crystal consisting of two or more domains with the same crystal lattice and composition but different crystal orientations. In other words, twins can be induced to change crystal directions. In this work we demonstrated that the epitaxial growth of () semi-polar AlN on (0001) AlN by constructing () and () twin structures. This new method is relative feasible than conventional methods and it has huge prospect to develop high-quality semi-polar AlN. PMID:27185345

  19. GaN grown on nano-patterned sapphire substrates

    NASA Astrophysics Data System (ADS)

    Jing, Kong; Meixin, Feng; Jin, Cai; Hui, Wang; Huaibing, Wang; Hui, Yang

    2015-04-01

    High-quality gallium nitride (GaN) film was grown on nano-patterned sapphire substrates (NPSS) and investigated using XRD and SEM. It was found that the optimum thickness of the GaN buffer layer on the NPSS is 15 nm, which is thinner than that on micro-patterned sapphire substrates (MPSS). An interesting phenomenon was observed for GaN film grown on NPSS:GaN mainly grows on the trench regions and little grows on the sidewalls of the patterns at the initial growth stage, which is dramatically different from GaN grown on MPSS. In addition, the electrical and optical properties of LEDs grown on NPSS were characterized. Project supported by the Suzhou Nanojoin Photonics Co., Ltd and the High-Tech Achievements Transformation of Jiangsu Province, China (No.BA2012010).

  20. Epitaxy of GaN Nanowires on Graphene.

    PubMed

    Kumaresan, Vishnuvarthan; Largeau, Ludovic; Madouri, Ali; Glas, Frank; Zhang, Hezhi; Oehler, Fabrice; Cavanna, Antonella; Babichev, Andrey; Travers, Laurent; Gogneau, Noelle; Tchernycheva, Maria; Harmand, Jean-Christophe

    2016-08-10

    Epitaxial growth of GaN nanowires on graphene is demonstrated using molecular beam epitaxy without any catalyst or intermediate layer. Growth is highly selective with respect to silica on which the graphene flakes, grown by chemical vapor deposition, are transferred. The nanowires grow vertically along their c-axis and we observe a unique epitaxial relationship with the ⟨21̅1̅0⟩ directions of the wurtzite GaN lattice parallel to the directions of the carbon zigzag chains. Remarkably, the nanowire density and height decrease with increasing number of graphene layers underneath. We attribute this effect to strain and we propose a model for the nanowire density variation. The GaN nanowires are defect-free and they present good optical properties. This demonstrates that graphene layers transferred on amorphous carrier substrates is a promising alternative to bulk crystalline substrates for the epitaxial growth of high quality GaN nanostructures. PMID:27414518

  1. Novel high frequency devices with graphene and GaN

    NASA Astrophysics Data System (ADS)

    Zhao, Pei

    This work focuses on exploring new materials and new device structures to develop novel devices that can operate at very high speed. In chapter 2, the high frequency performance limitations of graphene transistor with channel length less than 100 nm are explored. The simulated results predict that intrinsic cutoff frequency fT of graphene transistor can be close to 2 THz at 15 nm channel length. In chapter 3, we explored the possibility of developing a 2D materials based vertical tunneling device. An analytical model to calculate the channel potentials and current-voltage characteristics in a Symmetric tunneling Field-Effect-Transistor (SymFET) is presented. The symmetric resonant peak in SymFET is a good candidate for high-speed analog applications. Rest of the work focuses on Gallium Nitride (GaN), several novel device concepts based on GaN heterostructure have been proposed for high frequency and high power applications. In chapter 4, we compared the performance of GaN Schottky diodes on bulk GaN substrates and GaN-on-sapphire substrates. In addition, we also discussed the lateral GaN Schottky diode between metal/2DEGs. The advantage of lateral GaN Schottky diodes is the intrinsic cutoff frequency is in the THz range. In chapter 5, a GaN Heterostructure barrier diode (HBD) is designed using the polarization charge and band offset at the AlGaN/GaN heterojunction. The polarization charge at AlGaN/GaN interface behaves as a delta-doping which induces a barrier without any chemical doping. The IV characteristics can be explained by the barrier controlled thermionic emission current. GaN HBDs can be directly integrated with GaN HEMTs, and serve as frequency multipliers or mixers for RF applications. In chapter 6, a GaN based negative effective mass oscillator (NEMO) is proposed. The current in NEMO is estimated under the ballistic limits. Negative differential resistances (NDRs) can be observed with more than 50% of the injected electrons occupied the negative

  2. Fabrication of bamboo-shaped GaN nanorods

    NASA Astrophysics Data System (ADS)

    Li, H.; Li, J. Y.; He, M.; Chen, X. L.; Zhang, Z.

    Bamboo-shaped GaN nanorods were formed through a simple sublimation method. They were characterized by means of X-ray powder diffraction (XRD), transmission electron microscopy (TEM), high-resolution transmission electron microscopy (HRTEM) and selected-area electron diffraction (SAED). The TEM image showed that the nanorods were bamboo-like. XRD, HRTEM and SAED patterns indicated that the nanorods were single-crystal wurtzite GaN.

  3. Modeling of temperature sensor built on GaN nanostructures

    NASA Astrophysics Data System (ADS)

    Asgari, A.; Taheri, S.

    2011-03-01

    A GaN nanostructure based temperature sensor has been modeled using the minority-carrier exclusion theory. The model takes into account the effects of temperature, carrier concentrations and electric field on carrier mobilities. The model also consists of different carrier scattering mechanisms such as phonon and natural ionized scattering. The calculation results show that the resistance of modeled GaN nanostructure based temperature sensor is strongly dependent on the sensor structural parameters such as doping density and device size.

  4. ARM MJO Investigation Experiment on Gan Island (AMIE-Gan) Science Plan

    SciTech Connect

    Long, CL; Del Genio, A; Deng, M; Fu, X; Gustafson, W; Houze, R; Jakob, C; Jensen, M; Johnson, R; Liu, X; Luke, E; May, P; McFarlane, S; Minnis, P; Schumacher, C; Vogelmann, A; Wang, Y; Webster, P; Xie, S; Zhang, C

    2011-04-11

    The overarching campaign, which includes the ARM Mobile Facility 2 (AMF2) deployment in conjunction with the Dynamics of the Madden-Julian Oscillation (DYNAMO) and the Cooperative Indian Ocean experiment on intraseasonal variability in the Year 2011 (CINDY2011) campaigns, is designed to test several current hypotheses regarding the mechanisms responsible for Madden-Julian Oscillation (MJO) initiation and propagation in the Indian Ocean area. The synergy between the proposed AMF2 deployment with DYNAMO/CINDY2011, and the corresponding funded experiment on Manus, combine for an overarching ARM MJO Investigation Experiment (AMIE) with two components: AMF2 on Gan Island in the Indian Ocean (AMIE-Gan), where the MJO initiates and starts its eastward propagation; and the ARM Manus site (AMIE-Manus), which is in the general area where the MJO usually starts to weaken in climate models. AMIE-Gan will provide measurements of particular interest to Atmospheric System Research (ASR) researchers relevant to improving the representation of MJO initiation in climate models. The framework of DYNAMO/CINDY2011 includes two proposed island-based sites and two ship-based locations forming a square pattern with sonde profiles and scanning precipitation and cloud radars at both island and ship sites. These data will be used to produce a Variational Analysis data set coinciding with the one produced for AMIE-Manus. The synergy between AMIE-Manus and AMIE-Gan will allow studies of the initiation, propagation, and evolution of the convective cloud population within the framework of the MJO. As with AMIE-Manus, AMIE-Gan/DYNAMO also includes a significant modeling component geared toward improving the representation of MJO initiation and propagation in climate and forecast models. This campaign involves the deployment of the second, marine-capable, AMF; all of the included measurement systems; and especially the scanning and vertically pointing radars. The campaign will include sonde

  5. High nitrogen pressure solution growth of GaN

    NASA Astrophysics Data System (ADS)

    Bockowski, Michal

    2014-10-01

    Results of GaN growth from gallium solution under high nitrogen pressure are presented. Basic of the high nitrogen pressure solution (HNPS) growth method is described. A new approach of seeded growth, multi-feed seed (MFS) configuration, is demonstrated. The use of two kinds of seeds: free-standing hydride vapor phase epitaxy GaN (HVPE-GaN) obtained from metal organic chemical vapor deposition (MOCVD)-GaN/sapphire templates and free-standing HVPE-GaN obtained from the ammonothermally grown GaN crystals, is shown. Depending on the seeds’ structural quality, the differences in the structural properties of pressure grown material are demonstrated and analyzed. The role and influence of impurities, like oxygen and magnesium, on GaN crystals grown from gallium solution in the MFS configuration is presented. The properties of differently doped GaN crystals are discussed. An application of the pressure grown GaN crystals as substrates for electronic and optoelectronic devices is reported.

  6. Effect of photocatalytic oxidation technology on GaN CMP

    NASA Astrophysics Data System (ADS)

    Wang, Jie; Wang, Tongqing; Pan, Guoshun; Lu, Xinchun

    2016-01-01

    GaN is so hard and so chemically inert that it is difficult to obtain a high material removal rate (MRR) in the chemical mechanical polishing (CMP) process. This paper discusses the application of photocatalytic oxidation technology in GaN planarization. Three N-type semiconductor particles (TiO2, SnO2, and Fe2O3) are used as catalysts and added to the H2O2-SiO2-based slurry. By optical excitation, highly reactive photoinduced holes are produced on the surface of the particles, which can oxidize OH- and H2O absorbed on the surface of the catalysts; therefore, more OH* will be generated. As a result, GaN MRRs in an H2O2-SiO2-based polishing system combined with catalysts are improved significantly, especially when using TiO2, the MRR of which is 122 nm/h. The X-ray photoelectron spectroscopy (XPS) analysis shows the variation trend of chemical composition on the GaN surface after polishing, revealing the planarization process. Besides, the effect of pH on photocatalytic oxidation combined with TiO2 is analyzed deeply. Furthermore, the physical model of GaN CMP combined with photocatalytic oxidation technology is proposed to describe the removal mechanism of GaN.

  7. GaN Technology for Power Electronic Applications: A Review

    NASA Astrophysics Data System (ADS)

    Flack, Tyler J.; Pushpakaran, Bejoy N.; Bayne, Stephen B.

    2016-06-01

    Power semiconductor devices based on silicon (Si) are quickly approaching their limits, set by fundamental material properties. In order to address these limitations, new materials for use in devices must be investigated. Wide bandgap materials, such as silicon carbide (SiC) and gallium nitride (GaN) have suitable properties for power electronic applications; however, fabrication of practical devices from these materials may be challenging. SiC technology has matured to point of commercialized devices, whereas GaN requires further research to realize full material potential. This review covers fundamental material properties of GaN as they relate to Si and SiC. This is followed by a discussion of the contemporary issues involved with bulk GaN substrates and their fabrication and a brief overview of how devices are fabricated, both on native GaN substrate material and non-native substrate material. An overview of current device structures, which are being analyzed for use in power switching applications, is then provided; both vertical and lateral device structures are considered. Finally, a brief discussion of prototypes currently employing GaN devices is given.

  8. GaN Technology for Power Electronic Applications: A Review

    NASA Astrophysics Data System (ADS)

    Flack, Tyler J.; Pushpakaran, Bejoy N.; Bayne, Stephen B.

    2016-03-01

    Power semiconductor devices based on silicon (Si) are quickly approaching their limits, set by fundamental material properties. In order to address these limitations, new materials for use in devices must be investigated. Wide bandgap materials, such as silicon carbide (SiC) and gallium nitride (GaN) have suitable properties for power electronic applications; however, fabrication of practical devices from these materials may be challenging. SiC technology has matured to point of commercialized devices, whereas GaN requires further research to realize full material potential. This review covers fundamental material properties of GaN as they relate to Si and SiC. This is followed by a discussion of the contemporary issues involved with bulk GaN substrates and their fabrication and a brief overview of how devices are fabricated, both on native GaN substrate material and non-native substrate material. An overview of current device structures, which are being analyzed for use in power switching applications, is then provided; both vertical and lateral device structures are considered. Finally, a brief discussion of prototypes currently employing GaN devices is given.

  9. Comparative study of polar and semipolar (112⁻2) InGaN layers grown by metalorganic vapour phase epitaxy

    SciTech Connect

    Dinh, Duc V. E-mail: peter.parbrook@tyndall.ie; Zubialevich, V. Z.; Oehler, F.; Kappers, M. J.; Humphreys, C. J.; Alam, S. N.; Parbrook, P. J. E-mail: peter.parbrook@tyndall.ie; Caliebe, M.; Scholtz, F.

    2014-10-21

    InGaN layers were grown simultaneously on (112⁻2) GaN and (0001) GaN templates by metalorganic vapour phase epitaxy. At higher growth temperature (≥750°C), the indium content (<15%) of the (112⁻2) and (0001) InGaN layers was similar. However, for temperatures less than 750°C, the indium content of the (112⁻2) InGaN layers (15%–26%) were generally lower than those with (0001) orientation (15%–32%). The compositional deviation was attributed to the different strain relaxations between the (112⁻2) and (0001) InGaN layers. Room temperature photoluminescence measurements of the (112⁻2) InGaN layers showed an emission wavelength that shifts gradually from 380 nm to 580 nm with decreasing growth temperature (or increasing indium composition). The peak emission wavelength of the (112⁻2) InGaN layers with an indium content of more than 10% blue-shifted a constant value of ≈(50–60) nm when using higher excitation power densities. This blue-shift was attributed to band filling effects in the layers.

  10. Theoretical investigations of initial growth processes on semipolar AlN(11\\bar{2}2) surfaces under metal–organic vapor-phase epitaxy growth condition

    NASA Astrophysics Data System (ADS)

    Akiyama, Toru; Takemoto, Yoshitaka; Nakamura, Kohji; Ito, Tomonori

    2016-05-01

    The initial growth processes on semipolar AlN(11\\bar{2}2) surfaces, such as adsorption behavior of Al adatoms, are investigated on the basis of ab initio calculations and kinetic Monte Carlo (MC) simulations. By using surface phase diagrams, which are obtained by comparing the adsorption energy from ab initio calculations with gas-phase chemical potentials, we find that the adsorption of Al adatoms under H-poor condition is much easier than that under H-rich condition. Furthermore, our kinetic MC simulations demonstrate that the surface lifetime (diffusion length) of Al adatoms under H-poor condition is found to be four (two) orders of magnitude larger than that under H-rich condition. These differences implie that the growth under H-poor condition is much faster than that under H-rich condition, qualitatively consistent with the experimental results.

  11. Exciton localization in polar and semipolar (112̅2) In0.2Ga0.8N/GaN multiple quantum wells

    NASA Astrophysics Data System (ADS)

    Dinh, Duc V.; Presa, Silvino; Maaskant, Pleun P.; Corbett, Brian; Parbrook, Peter J.

    2016-08-01

    The exciton localization (ELZ) in polar (0001) and semipolar (112̅2) In{}0.2Ga{}0.8{{N}} multiple-quantum-well (MQW) structures has been studied by excitation power density and temperature dependent photoluminescence. The ELZ in the (112̅2) MQW was found to be much stronger (ELZ degree σ E ∼ 40 –70 meV) compared to the (0001) MQW (σ E ∼ 5‑11 meV) that was attributed to the anisotropic growth on the (112̅2) surface. This strong ELZ was found to cause a blue-shift of the (112̅2) MQW exciton emission with rising temperature from 200 to 340 K, irrespective of excitation source used. A lower luminescence efficiency of the (112̅2) MQW was attributed to their anisotropic growth, and higher concentrations of unintentional impurities and point defects than the (0001) MQW.

  12. High quality semipolar (11{sup ¯}02) AlGaN/AlN quantum wells with remarkably enhanced optical transition probabilities

    SciTech Connect

    Ichikawa, S. Iwata, Y.; Funato, M.; Kawakami, Y.; Nagata, S.

    2014-06-23

    Adjusting the growth conditions from those for c-plane growth realizes high-quality semipolar (11{sup ¯}02) AlGaN/AlN quantum wells (QWs) with atomically smooth surfaces and abrupt interfaces on AlN substrates. Upon comparing the optical properties to those of c-plane QWs using time-integrated and time-resolved photoluminescence spectroscopy, the estimated internal electric field is much smaller in (11{sup ¯}02) AlGaN/AlN QWs than in c-plane QWs. Thus, (11{sup ¯}02) AlGaN/AlN QWs have narrower emission line widths and remarkably faster radiative recombination lifetimes, realizing highly efficient deep ultraviolet emissions.

  13. Prospect of GaN light-emitting diodes grown on glass substrates

    NASA Astrophysics Data System (ADS)

    Choi, Jun-Hee; Lee, Yun Sung; Baik, Chan Wook; Ahn, Ho Young; Cho, Kyung Sang; Kim, Sun Il; Hwang, Sungwoo

    2013-03-01

    We report the enhanced electroluminescence (EL) of GaN light-emitting diodes (LEDs) on glass substrates. We found that GaN morphology affected the EL and achieved enhanced EL of GaN-LEDs on glass by identifying the optimal GaN morphology having both high crystallinity and compatibility for device fabrication. At proper growth temperature, GaN crystallinity was improved with increasing GaN crystal size irrespective of the GaN crystallographic orientation, as determined by spatially resolved cathodoluminescent spectroscopy. The optimized GaN LEDs on glass composed of the nearly single-crystalline GaN pyramid arrays exhibited excellent microscopic EL uniformity and luminance values of ~ 9100 cd/m2 at the peak wavelength of 495 nm. The EL color could be adjusted mainly by varying the quantum well temperature. In addition, new growth methods for achieving high GaN crystallinity at a low growth temperature (e.g. ~700°C) were briefly reviewed and attempted by adopting selective heating. We expect that performance of the GaN LEDs on glass can be much enhanced by enhancing GaN crystallinity and p-GaN coating, and evolvement of low-temperature growth of high-quality GaN might even customize ordinary glass as a substrate, which enables high-performance, low-cost lighting or display.

  14. Pulsed laser annealing of Be-implanted GaN

    SciTech Connect

    Wang, H.T.; Tan, L.S.; Chor, E.F.

    2005-11-01

    Postimplantation thermal processing of Be in molecular-beam-epitaxy-grown GaN by rapid thermal annealing (RTA) and pulsed laser annealing (PLA) was investigated. It has been found that the activation of Be dopants and the repair of implantation-induced defects in GaN films cannot be achieved efficiently by conventional RTA alone. On the other hand, good dopant activation and surface morphology and quality were obtained when the Be-implanted GaN film was annealed by PLA with a 248 nm KrF excimer laser. However, observations of off-resonant micro-Raman and high-resolution x-ray-diffraction spectra indicated that crystal defects and strain resulting from Be implantation were still existent after PLA, which probably degraded the carrier mobility and limited the activation efficiency to some extent. This can be attributed to the shallow penetration depth of the 248 nm laser in GaN, which only repaired the crystal defects in a thin near-surface layer, while the deeper defects were not annealed out well. This situation was significantly improved when the Be-implanted GaN was subjected to a combined process of PLA followed by RTA, which produced good activation of the dopants, good surface morphology, and repaired bulk and surface defects well.

  15. Native defects in GaN: a hybrid functional study

    NASA Astrophysics Data System (ADS)

    Diallo, Ibrahima Castillo; Demchenko, Denis

    Intrinsic defects play an important role in the performance of GaN-based devices. We present hybrid density functional calculations of the electronic and possible optical properties of interstitial N (Ni-Ni) , N antisite (NGa) , interstitial Ga (Gai) , Ga antisite (GaN) , Ga vacancy (VGa) , N vacancy (VN) and Ga-N divacancies (VGaVN) in GaN. Our results show that the vacancies display relatively low formation energies in certain samples, whereas antisites and interstitials are energetically less favorable. However, interstitials can be created by electron irradiation. For instance, in 2.5 MeV electron-irradiated GaN samples, a strong correlation between the frequently observed photoluminescence (PL) band centered around 0.85 eV accompanied with a rich phonon sideband of ~0.88 eV and the theoretical optical behavior of interstitial Ga is discussed. N vacancies are found to likely contribute to the experimentally obtained green luminescence band (GL2) peaking at 2.24 eV in high-resistivity undoped and Mg-doped GaN. National Science Foundation (DMR-1410125) and the Thomas F. and Kate Miller Jeffress Memorial Trust.

  16. Evaluating the well-to-well distribution of radiative recombination rates in semi-polar (11\\bar{2}2) InGaN multiple-quantum-well light-emitting diodes

    NASA Astrophysics Data System (ADS)

    Funato, Mitsuru; Matsufuji, Kohei; Kawakami, Yoichi

    2016-07-01

    The distribution of well-to-well radiative recombination rates (RRRs) in an electrically driven semi-polar (11\\bar{2}2) InGaN multiple-quantum-well light-emitting diode (LED) is investigated within an electron–hole recombination picture. Compared to the reference (0001) LED, the (11\\bar{2}2) LED exhibits uniform well-to-well RRR distributions, which are less dependent on the injection current, because of the weaker polarization field. The smaller dependence of the RRR distribution on the injection current suggests that (11\\bar{2}2) LEDs can be applied to polychromatic LEDs consisting of quantum wells with different emission colors in electrical series because a current-insensitive apparent emission color is expected. A proof-of-concept polychromatic LED is demonstrated on the semi-polar (11\\bar{2}2) plane.

  17. Structural defects in bulk GaN

    NASA Astrophysics Data System (ADS)

    Liliental-Weber, Z.; dos Reis, R.; Mancuso, M.; Song, C. Y.; Grzegory, I.; Porowski, S.; Bockowski, M.

    2014-10-01

    Transmission Electron Microscopy (TEM) studies of undoped and Mg doped GaN layers grown on the HVPE substrates by High Nitrogen Pressure Solution (HNPS) with the multi-feed-seed (MFS) configuration are shown. The propagation of dislocations from the HVPE substrate to the layer is observed. Due to the interaction between these dislocations in the thick layers much lower density of these defects is observed in the upper part of the HNPS layers. Amorphous Ga precipitates with attached voids pointing toward the growth direction are observed in the undoped layer. This is similar to the presence of Ga precipitates in high-pressure platelets, however the shape of these precipitates is different. The Mg doped layers do not show Ga precipitates, but MgO rectangular precipitates are formed, decorating the dislocations. Results of TEM studies of HVPE layers grown on Ammonothermal substrates are also presented. These layers have superior crystal quality in comparison to the HNPS layers, as far as density of dislocation is concern. Occasionally some small inclusions can be found, but their chemical composition was not yet determined. It is expected that growth of the HNPS layers on these substrate will lead to large layer thickness obtained in a short time and with high crystal perfection needed in devices.

  18. High Voltage GaN Schottky Rectifiers

    SciTech Connect

    CAO,X.A.; CHO,H.; CHU,S.N.G.; CHUO,C.-C.; CHYI,J.-I.; DANG,G.T.; HAN,JUNG; LEE,C.-M.; PEARTON,S.J.; REN,F.; WILSON,R.G.; ZHANG,A.P.

    1999-10-25

    Mesa and planar GaN Schottky diode rectifiers with reverse breakdown voltages (V{sub RB}) up to 550V and >2000V, respectively, have been fabricated. The on-state resistance, R{sub ON}, was 6m{Omega}{center_dot} cm{sup 2} and 0.8{Omega}cm{sup 2}, respectively, producing figure-of-merit values for (V{sub RB}){sup 2}/R{sub ON} in the range 5-48 MW{center_dot}cm{sup -2}. At low biases the reverse leakage current was proportional to the size of the rectifying contact perimeter, while at high biases the current was proportional to the area of this contact. These results suggest that at low reverse biases, the leakage is dominated by the surface component, while at higher biases the bulk component dominates. On-state voltages were 3.5V for the 550V diodes and {ge}15 for the 2kV diodes. Reverse recovery times were <0.2{micro}sec for devices switched from a forward current density of {approx}500A{center_dot}cm{sup -2} to a reverse bias of 100V.

  19. Conductivity based on selective etch for GaN devices and applications thereof

    SciTech Connect

    Zhang, Yu; Sun, Qian; Han, Jung

    2015-12-08

    This invention relates to methods of generating NP gallium nitride (GaN) across large areas (>1 cm.sup.2) with controlled pore diameters, pore density, and porosity. Also disclosed are methods of generating novel optoelectronic devices based on porous GaN. Additionally a layer transfer scheme to separate and create free-standing crystalline GaN thin layers is disclosed that enables a new device manufacturing paradigm involving substrate recycling. Other disclosed embodiments of this invention relate to fabrication of GaN based nanocrystals and the use of NP GaN electrodes for electrolysis, water splitting, or photosynthetic process applications.

  20. Temperature dependent growth of GaN nanowires using CVD technique

    NASA Astrophysics Data System (ADS)

    Kumar, Mukesh; Kumar, Vikram; Singh, R.

    2016-05-01

    Growth of GaN nanowires have been carried out on sapphire substrates with Au as a catalyst using chemical vapour deposition technique. GaN nanowires growth have been studied with the experimental parameter as growth temperature. Diameter of grown GaN nanowires are in the range of 50 nm to 100 nm while the nanowire length depends on growth temperature. Morphology of the GaN nanowires have been studied by scanning electron microscopy. Crystalline nature has been observed by XRD patterns. Optical properties of grown GaN nanowires have been investigated by photoluminescence spectra.

  1. Desorption Induced Formation of Negative Nanowires in GaN

    SciTech Connect

    Stach, E.A.; Kim, B.-J.

    2011-06-01

    We report in-situ transmission electron microscopy studies of the formation of negative nanowires created by thermal decomposition of single crystal GaN. During annealing, vertical negative nanowires are formed in [0 0 0 1] by preferential dissociation of GaN along the 1 0 {bar 1} 0 prism planes, while lateral negative nanowires grow in close-packed 1 0 {bar 1} 0 by the self-catalytic solid-liquid-vapor (SLV) mechanism. Our quantitative measurements show that the growth rates of the laterally grown negative nanowires are independent of the wire diameter, indicating that the rate-limiting step is the decomposition of GaN on the surface of the Ga droplets that catalyze their creation. These nanoscale features offer controllable templates for the creation and integration of a broad range of nanoscale materials systems, with potential applications in nanoscale fluidics.

  2. Gate stack engineering for GaN lateral power transistors

    NASA Astrophysics Data System (ADS)

    Yang, Shu; Liu, Shenghou; Liu, Cheng; Hua, Mengyuan; Chen, Kevin J.

    2016-02-01

    Developing optimal gate-stack technology is a key to enhancing the reliability and performance of GaN insulated-gate devices for high-voltage power switching applications. In this paper, we discuss current challenges and review our recent progresses in gate-stack technology development toward high-performance and high-reliability GaN power devices, including (1) interface engineering that creates a high-quality dielectric/III-nitride interface with low trap density; (2) barrier-layer engineering that enables optimal trade-off between performance and stability; (3) bulk quality and reliability enhancement of the gate dielectric. These gate-stack techniques in terms of new process development and device structure design are valuable to realize highly reliable and competitive GaN power devices.

  3. Curvature and bow of bulk GaN substrates

    NASA Astrophysics Data System (ADS)

    Foronda, Humberto M.; Romanov, Alexey E.; Young, Erin C.; Roberston, Christian A.; Beltz, Glenn E.; Speck, James S.

    2016-07-01

    We investigate the bow of free standing (0001) oriented hydride vapor phase epitaxy grown GaN substrates and demonstrate that their curvature is consistent with a compressive to tensile stress gradient (bottom to top) present in the substrates. The origin of the stress gradient and the curvature is attributed to the correlated inclination of edge threading dislocation (TD) lines away from the [0001] direction. A model is proposed and a relation is derived for bulk GaN substrate curvature dependence on the inclination angle and the density of TDs. The model is used to analyze the curvature for commercially available GaN substrates as determined by high resolution x-ray diffraction. The results show a close correlation between the experimentally determined parameters and those predicted from theoretical model.

  4. Strong atomic ordering in Gd-doped GaN

    SciTech Connect

    Ishimaru, Manabu; Higashi, Kotaro; Hasegawa, Shigehiko; Asahi, Hajime; Sato, Kazuhisa; Konno, Toyohiko J.

    2012-09-03

    Gd-doped GaN (Ga{sub 1-x}Gd{sub x}N) thin films were grown on a GaN(001) template by radio frequency plasma-assisted molecular beam epitaxy and characterized by means of x-ray diffraction (XRD) and transmission electron microscopy (TEM). Three samples with a different Gd composition were prepared in this study: x = 0.02, 0.05, and 0.08. XRD and TEM results revealed that the low Gd concentration GaN possesses the wurtzite structure. On the other hand, it was found that an ordered phase with a quadruple-periodicity along the [001] direction in the wurtzite structure is formed throughout the film with x = 0.08. We proposed the atomistic model for the superlattice structure observed here.

  5. Biosensors based on GaN nanoring optical cavities

    NASA Astrophysics Data System (ADS)

    Kouno, Tetsuya; Takeshima, Hoshi; Kishino, Katsumi; Sakai, Masaru; Hara, Kazuhiko

    2016-05-01

    Biosensors based on GaN nanoring optical cavities were demonstrated using room-temperature photoluminescence measurements. The outer diameter, height, and thickness of the GaN nanorings were approximately 750–800, 900, and 130–180 nm, respectively. The nanorings functioned as whispering-gallery-mode (WGM)-type optical cavities and exhibited sharp resonant peaks like lasing actions. The evanescent component of the WGM was strongly affected by the refractive index of the ambient environment, the type of liquid, and the sucrose concentration of the analyzed solution, resulting in shifts of the resonant wavelengths. The results indicate that the GaN nanorings can potentially be used in sugar sensors of the biosensors.

  6. Structure investigations of nonpolar GaN layers.

    PubMed

    Neumann, W; Mogilatenko, A; Wernicke, T; Richter, E; Weyers, M; Kneissl, M

    2010-03-01

    The microstructure of nonpolar m-plane (1100) oriented GaN layers deposited on (100)gamma-LiAlO(2) was analysed by transmission electron microscopy. This study shows that the films contain a large number of defects. The most dominant defects in the m-plane GaN are intrinsic I(1) basal plane stacking faults (approximately 10(4) cm(-1)), threading dislocations (approximately 10(9) cm(-2)) as well as a complex defect network consisting of planar defects located on prismatic {1010} GaN and differently inclined pyramidal planes. A large number of the stacking faults nucleate at the GaN/LiAlO(2) interface. Furthermore, the inclined planar defects act as additional nucleation sites for the basal plane stacking faults. A decreasing crystal quality with an increasing layer thickness can be explained by this defect formation mechanism. PMID:20500386

  7. Surface morphology of GaN: Flat versus vicinal surfaces

    SciTech Connect

    Xie, M.H.; Seutter, S.M.; Zheng, L.X.; Cheung, S.H.; Ng, Y.F.; Wu, H.; Tong, S.Y.

    2000-07-01

    The surface morphology of GaN films grown by molecular beam epitaxy (MBE) is investigated by scanning tunneling microscopy (STM). A comparison is made between flat and vicinal surfaces. The wurtzite structure of GaN leads to special morphological features such as step pairing and triangularly shaped islands. Spiral mounds due to growth at screw threading dislocations are dominant on flat surfaces, whereas for vicinal GaN, the surfaces show no spiral mound but evenly spaced steps. This observation suggests an effective suppression of screw threading dislocations in the vicinal films. This finding is confirmed by transmission electron microscopy (TEM) studies. Continued growth of the vicinal surface leads to step bunching that is attributed to the effect of electromigration.

  8. High-Sensitivity GaN Microchemical Sensors

    NASA Technical Reports Server (NTRS)

    Son, Kyung-ah; Yang, Baohua; Liao, Anna; Moon, Jeongsun; Prokopuk, Nicholas

    2009-01-01

    Systematic studies have been performed on the sensitivity of GaN HEMT (high electron mobility transistor) sensors using various gate electrode designs and operational parameters. The results here show that a higher sensitivity can be achieved with a larger W/L ratio (W = gate width, L = gate length) at a given D (D = source-drain distance), and multi-finger gate electrodes offer a higher sensitivity than a one-finger gate electrode. In terms of operating conditions, sensor sensitivity is strongly dependent on transconductance of the sensor. The highest sensitivity can be achieved at the gate voltage where the slope of the transconductance curve is the largest. This work provides critical information about how the gate electrode of a GaN HEMT, which has been identified as the most sensitive among GaN microsensors, needs to be designed, and what operation parameters should be used for high sensitivity detection.

  9. 47,XY,+der(X)t(X;18)(p11.4;p11.22): A Unique Aneuploidy Associated with Klinefelter Syndrome due to an Extra Derivative X Chromosome Inherited Maternally.

    PubMed

    Liang, Ji; Zhang, Yongsheng; Wang, Ruixue; Liang, Zuowen; Yue, Jiaming; Liu, Ruizhi

    2015-01-01

    A derivative X chromosome formed by translocation involving an X chromosome and a chromosome 18 in a Klinefelter syndrome (KS) patient with a 47,XXY karyotype has not been reported before. In this study, we present the clinical and molecular cytogenetic characteristics. The patient presented with small testes and azoospermia. G-banding analysis identified the karyotype as 47,XY,del(X)(p?11.4). Array CGH detected a 10.36-Mb duplication of chromosome region 18p11.22p11.32 (14,316-10,377,516) and a 111.18-Mb duplication of chromosome region Xp11.4q28 (61,931, 689-155,111,583), in addition to the normal chromosome 18 and an X chromosome. FISH results further revealed the extra 18p located at the end of the short arm of a deleted X chromosome, forming a derivative X chromosome. Finally, we identified the karyotype of the patient as 47,XY,+der(X)t(X;18)(p11.4;p11.22). The derivative X chromosome was maternally inherited. To our knowledge, this rare karyotype has not yet been reported in the literature. The present study may suggest a novel karyotype associated with KS. PMID:26430900

  10. Study of photoemission mechanism for varied doping GaN photocathode

    NASA Astrophysics Data System (ADS)

    Qiao, Jianliang; Xu, Yuan; Niu, Jun; Gao, Youtang; Chang, Benkang

    2015-10-01

    Negative electron affinity (NEA) GaN photocathode has many virtues, such as high quantum efficiency, low dark current, concentrated electrons energy distribution and angle distribution, adjustive threshold and so on. The quantum efficiency is an important parameter for the preparation and evaluation of NEA GaN photocathode. The varied doping GaN photocathode has the directional inside electric field within the material, so the higher quantum efficiency can be obtained. The varied doping NEA GaN photocathode has better photoemission performance. According to the photoemission theory of NEA GaN photocathode, the quantum efficiency formulas for uniform doping and varied doping NEA GaN photocathodes were given. In the certain condition, the quantum efficiency formula for varied doping GaN photocathode consists with the uniform doping. The activation experiment was finished for varied doping GaN photocathode. The cleaning method and technics for varied doping GaN photocathode were given in detail. To get an atom clean surface, the heat cleaning must be done after the chemical cleaning. Using the activation and evaluation system for NEA photocathode, the varied doping GaN photocathode was activated with Cs and O, and the photocurrent curve for varied doping GaN photocathode was gotten.

  11. GaN nanowire arrays by a patterned metal-assisted chemical etching

    NASA Astrophysics Data System (ADS)

    Wang, K. C.; Yuan, G. D.; Wu, R. W.; Lu, H. X.; Liu, Z. Q.; Wei, T. B.; Wang, J. X.; Li, J. M.; Zhang, W. J.

    2016-04-01

    We developed an one-step and two-step metal-assisted chemical etching method to produce self-organized GaN nanowire arrays. In one-step approach, GaN nanowire arrays are synthesized uniformly on GaN thin film surface. However, in a two-step etching processes, GaN nanowires are formed only in metal uncovered regions, and GaN regions with metal-covering show nano-porous sidewalls. We propose that nanowires and porous nanostructures are tuned by sufficient and limited etch rate, respectively. PL spectra shows a red-shift of band edge emission in GaN nanostructures. The formation mechanism of nanowires was illustrated by two separated electrochemical reactions occur simultaneously. The function of metals and UV light was illustrated by the scheme of potential relationship between energy bands in Si, GaN and standard hydrogen electrode potential of solution and metals.

  12. First-principles study of d0 ferromagnetism in alkali-metal doped GaN

    NASA Astrophysics Data System (ADS)

    Zhang, Yong

    2016-08-01

    The d0 ferromagnetism in GaN has been studied based on density functional theory. Our results show that GaN with sufficient hole become spin-polarized. Alkali-metal doping can introduce holes in GaN. Among them, both of Li- and Na-doping induce ferromagnetism in GaN and Na-doped GaN behaves as half-metallic ferromagnet. Moreover, at a growth temperature of 2000 K under N-rich condition, both concentrations can exceed 18%, which is sufficient to produce detectable macroscopic magnetism in GaN. The Curie temperature of Li- and Na-doped GaN is estimated to be 304 and 740 K, respectively, which are well above room temperature.

  13. Development of Partial-Charge Potential for GaN

    SciTech Connect

    Gao, Fei; Devanathan, Ram; Oda, Takuji; Weber, William J.

    2006-09-01

    Partial-charged potentials for GaN are systematically developed that describes a wide range of structural properties, where the reference data for fitting the potential parameters are taken from ab initial calculations or experiments. The present potential model provides a good fit to different structural geometries and high pressure phases of GaN. The high-pressure transition from wurtzite to rock-salt structure is correctly described yielding the phase transition pressure of about 55 GPa, and the calculated volume change at the transition is in good agreement with experimental data. The results are compared with those obtained by ab initio simulations.

  14. Ferromagnetism in undoped One-dimensional GaN Nanowires

    SciTech Connect

    Jeganathan, K. E-mail: jagan@physics.bdu.ac.in; Purushothaman, V.; Debnath, R.; Arumugam, S.

    2014-05-15

    We report an intrinsic ferromagnetism in vertical aligned GaN nanowires (NW) fabricated by molecular beam epitaxy without any external catalyst. The magnetization saturates at ∼0.75 × emu/gm with the applied field of 3000 Oe for the NWs grown under the low-Gallium flux of 2.4 × 10{sup −8} mbar. Despite a drop in saturation magnetization, narrow hysteresis loop remains intact regardless of Gallium flux. Magnetization in vertical standing GaN NWs is consistent with the spectral analysis of low-temperature photoluminescence pertaining to Ga-vacancies associated structural defects at the nanoscale.

  15. Femtosecond Studies of Carrier Dynamics in GaN

    NASA Astrophysics Data System (ADS)

    Zhang, Zhuhong; Zeng, Wensheng; Xu, Su; Makinen, Antti J.; Wicks, Gary W.; Gao, Yongli

    1998-03-01

    Ultrafast carrier dynamics were measured in GaN by femtosecond two-color pump-probe technique with 150fs resolution. Undoped wurtzite GaN sample studied in this work was grown by moecular beam epitaxy on a (0001)-oriented sapphire substrate. Third harmonic wave from Ti:sapphire Regen was employed as pump and second harmonic as probe. Transient transmission measurement shows the electron-phonon scattering and longitutal optical phonons relaxation. A simply two temperature model is used to explain the results.

  16. Persistent photoconductivity in neutron irradiated GaN

    NASA Astrophysics Data System (ADS)

    Minglan, Zhang; Ruixia, Yang; Naixin, Liu; Xiaoliang, Wang

    2013-09-01

    Unintentionally doped GaN films grown by MOCVD were irradiated with neutrons at room temperature. In order to investigate the influence of neutron irradiation on the optical properties of GaN films, persistent photoconductivity (PPC) and low temperature photoluminescence (PL) measurements were carried out. Pronounced PPC was observed in the samples before and after neutron irradiation without the appearance of a yellow luminescence (YL) band in the PL spectrum, suggesting that the origin of PPC and YL are not related. Moreover, PPC phenomenon was enhanced by neutron irradiation and quenched by the followed annealing process at 900 °C. The possible origin of PPC is discussed.

  17. Dislocation luminescence in GaN single crystals under nanoindentation

    NASA Astrophysics Data System (ADS)

    Huang, Jun; Xu, Ke; Fan, Ying Min; Wang, Jian Feng; Zhang, Ji Cai; Ren, Guo Qiang

    2014-12-01

    This work presents an experimental study on the dislocation luminescence in GaN by nanoindentation, cathodoluminescence, and Raman. The dislocation luminescence peaking at 3.12 eV exhibits a series of special properties in the cathodoluminescence measurements, and it completely disappears after annealing at 500°C. Raman spectroscopy shows evidence for existence of vacancies in the indented region. A comprehensive investigation encompassing cathodoluminescence, Raman, and annealing experiments allow the assignment of dislocation luminescence to conduction-band-acceptor transition involving Ga vacancies. The nanoscale plasticity of GaN can be better understood by considering the dislocation luminescence mechanism.

  18. Synthesis of p-type GaN nanowires

    NASA Astrophysics Data System (ADS)

    Kim, Sung Wook; Park, Youn Ho; Kim, Ilsoo; Park, Tae-Eon; Kwon, Byoung Wook; Choi, Won Kook; Choi, Heon-Jin

    2013-08-01

    GaN has been utilized in optoelectronics for two decades. However, p-type doping still remains crucial for realization of high performance GaN optoelectronics. Though Mg has been used as a p-dopant, its efficiency is low due to the formation of Mg-H complexes and/or structural defects in the course of doping. As a potential alternative p-type dopant, Cu has been recognized as an acceptor impurity for GaN. Herein, we report the fabrication of Cu-doped GaN nanowires (Cu:GaN NWs) and their p-type characteristics. The NWs were grown vertically via a vapor-liquid-solid (VLS) mechanism using a Au/Ni catalyst. Electrical characterization using a nanowire-field effect transistor (NW-FET) showed that the NWs exhibited n-type characteristics. However, with further annealing, the NWs showed p-type characteristics. A homo-junction structure (consisting of annealed Cu:GaN NW/n-type GaN thin film) exhibited p-n junction characteristics. A hybrid organic light emitting diode (OLED) employing the annealed Cu:GaN NWs as a hole injection layer (HIL) also demonstrated current injected luminescence. These results suggest that Cu can be used as a p-type dopant for GaN NWs.GaN has been utilized in optoelectronics for two decades. However, p-type doping still remains crucial for realization of high performance GaN optoelectronics. Though Mg has been used as a p-dopant, its efficiency is low due to the formation of Mg-H complexes and/or structural defects in the course of doping. As a potential alternative p-type dopant, Cu has been recognized as an acceptor impurity for GaN. Herein, we report the fabrication of Cu-doped GaN nanowires (Cu:GaN NWs) and their p-type characteristics. The NWs were grown vertically via a vapor-liquid-solid (VLS) mechanism using a Au/Ni catalyst. Electrical characterization using a nanowire-field effect transistor (NW-FET) showed that the NWs exhibited n-type characteristics. However, with further annealing, the NWs showed p-type characteristics. A homo

  19. Improved Semipolar (112¯2) GaN Quality Grown on m-Plane Sapphire Substrates by Metal Organic Chemical Vapor Deposition Using Self-Organized SiN x Interlayer

    NASA Astrophysics Data System (ADS)

    Sheng-Rui, Xu; Ying, Zhao; Teng, Jiang; Jin-Cheng, Zhang; Pei-Xian, Li; Yue, Hao

    2016-06-01

    Not Available Supported by the National Natural Science Foundation of China under Grant Nos 61204006 and 61574108, the Fundamental Research Funds for the Central Universities under Grant No JB141101, and the Foundation of Key Laboratory of Nanodevices and Applications of Suzhou Institute of Nano-Tech and Nano-Bionics of Chinese Academy of Sciences under Grant No 15CS01.

  20. Structural and vibrational properties of GaN

    NASA Astrophysics Data System (ADS)

    Deguchi, T.; Ichiryu, D.; Toshikawa, K.; Sekiguchi, K.; Sota, T.; Matsuo, R.; Azuhata, T.; Yamaguchi, M.; Yagi, T.; Chichibu, S.; Nakamura, S.

    1999-08-01

    Structural and vibrational properties of device quality pure GaN substrate grown using a lateral epitaxial overgrowth (LEO) technique were studied using x-ray diffraction, Brillouin, Raman, and infrared spectroscopy. Lattice constants were found to be a=3.1896±0.0002 Å and c=5.1855±0.0002 Å. Comparing the results with those on GaN epilayer directly grown on sapphire substrate, it is shown that the GaN substrate is indeed of high quality, i.e., the lattice is relaxed. However the GaN substrate has a small enough but finite residual strain arising from the pileup of the lateral growth front on SiO2 masks in the course of LEO. It was also found that the elastic stiffness constants C13 and C44, are more sensitive to the residual strain than the optical phonon frequencies. The high frequency and static dielectric constants were found to be 5.14 and 9.04. The Born and Callen effective charges were found to be 2.56 and 0.50.

  1. Growth of ZnO and GaN Films

    NASA Astrophysics Data System (ADS)

    Chang, J.; Hong, S.-K.; Matsumoto, K.; Tokunaga, H.; Tachibana, A.; Lee, S. W.; Cho, M.-W.

    . Zinc oxide (ZnO) and gallium nitride (GaN) are wide bandgap semi conductors applicable to light emitting diodes (LEDs) and laser diodes (LDs) with wavelengths ranging from ultraviolet to blue light. Now ZnO and GaN are key ma terials for optoelectronic device applications and their applications are being rapidly expanded to lots of other technology including electronics, biotechnology, nanotech-nology, and fusion technology among all these. As a fundamental starting point for the development of this new technique, epitaxy of ZnO and GaN films is one of the most important key technology. Hence, development of the growth technique for high quality epitaxial films is highly necessary. Among the various kinds of epi taxy technique for semiconductor films developed so far, physical vapor deposition (PVD)-based epitaxy technique has been revealed to be the appropriate way for the high quality ZnO film and related alloy growths, while chemical vapor deposition (CVD)-based epitaxy technique has been proved to be the best method for the high quality GaN film and related alloy growths.

  2. Properties of H, O and C in GaN

    SciTech Connect

    Pearton, S.J.; Abernathy, C.R.; Lee, J.W.

    1996-04-01

    The electrical properties of the light ion impurities H, O and C in GaN have been examined in both as-grown and implanted material. H is found to efficiently passivate acceptors such as Mg, Ca and C. Reactivation occurs at {ge} 450 C and is enhanced by minority carrier injection. The hydrogen does not leave the GaN crystal until > 800 C, and its diffusivity is relatively high ({approximately} 10{sup {minus}11} cm{sup 2}/s) even at low temperatures (< 200 C) during injection by wet etching, boiling in water or plasma exposure. Oxygen shows a low donor activation efficiency when implanted into GaN, with an ionization level of 30--40 meV. It is essentially immobile up to 1,100 C. Carbon can produce low p-type levels (3 {times} 10{sup 17} cm{sup {minus}3}) in GaN during MOMBE, although there is some evidence it may also create n-type conduction in other nitrides.

  3. NQRS Data for GaN (Subst. No. 2219)

    NASA Astrophysics Data System (ADS)

    Chihara, H.; Nakamura, N.

    This document is part of Subvolume B 'Substances Containing C10H16 … Zn' of Volume 48 'Nuclear Quadrupole Resonance Spectroscopy Data' of Landolt-Börnstein - Group III 'Condensed Matter'. It contains an extract of Section '3.2 Data tables' of the Chapter '3 Nuclear quadrupole resonance data' providing the NQRS data for GaN (Subst. No. 2219)

  4. Photoluminescence of Zn-implanted GaN

    NASA Technical Reports Server (NTRS)

    Pankove, J. I.; Hutchby, J. A.

    1974-01-01

    The photoluminescence spectrum of Zn-implanted GaN peaks at 2.87 eV at room temperature. The emission efficiency decreases linearly with the logarithm of the Zn concentration in the range from 1 x 10 to the 18th to 20 x 10 to the 18th Zn/cu cm.

  5. Crystallization of free standing bulk GaN by HVPE

    NASA Astrophysics Data System (ADS)

    Ucznik, B.; Pastuszka, B.; Grzegory, I.; Bokowski, M.; Kamler, G.; Domagaa, J.; Nowak, G.; Prystawko, P.; Krukowski, S.; Porowski, S.

    2006-06-01

    Gallium nitride was crystallized on 2 inch MOVPE GaN/sapphire substrates by Hydride Vapor Phase Epitaxy. A stable growth has been achieved in long duration (>10 h) processes at growth rates bigger than 100 m/h. As a result, entirely transparent and colorless bulk crystals with thickness exceeding 2 mm were obtained. The cracks in the thick HVPE GaN layers deposited on the MOVPE GaN/sapphire substrates can appear especially during cooling of the system after crystallization. It is shown that the formation of cracks at cooling is dependent on the gradients in the layer thickness The relaxation of strains in the resulting crystal coupled to the substrate leads to the self separation of GaN from sapphire. (At present 30 x 30 x 2 mm free standing bulk GaN crystals are obtained). The GaN crystals are characterized by defect selective etching (DSE) and X-ray diffraction. The density of threading dislocations (measured by DSE of (0001) surface) decreases with the thickness of the HVPE layer and becomes lower than 107 cm-2 in the layers thicker than app. 1 mm. The X-ray rocking curves for (0002) reflection (slit 0.5 x 0.1 mm) are in the range of 80-95 arcsec. However, larger scans reveal bending of crystallographic {0001} planes. The behavior of these deformed free standing crystals used as substrates for HVPE re-growth is also analyzed.

  6. Refractive index of erbium doped GaN thin films

    SciTech Connect

    Alajlouni, S.; Sun, Z. Y.; Li, J.; Lin, J. Y.; Jiang, H. X.; Zavada, J. M.

    2014-08-25

    GaN is an excellent host for erbium (Er) to provide optical emission in the technologically important as well as eye-safe 1540 nm wavelength window. Er doped GaN (GaN:Er) epilayers were synthesized on c-plane sapphire substrates using metal organic chemical vapor deposition. By employing a pulsed growth scheme, the crystalline quality of GaN:Er epilayers was significantly improved over those obtained by conventional growth method of continuous flow of reaction precursors. X-ray diffraction rocking curve linewidths of less than 300 arc sec were achieved for the GaN (0002) diffraction peak, which is comparable to the typical results of undoped high quality GaN epilayers and represents a major improvement over previously reported results for GaN:Er. Spectroscopic ellipsometry was used to determine the refractive index of the GaN:Er epilayers in the 1540 nm wavelength window and a linear dependence on Er concentration was found. The observed refractive index increase with Er incorporation and the improved crystalline quality of the GaN:Er epilayers indicate that low loss GaN:Er optical waveguiding structures are feasible.

  7. Luminescence properties of defects in GaN

    SciTech Connect

    Reshchikov, Michael A.; Morkoc, Hadis

    2005-03-15

    Gallium nitride (GaN) and its allied binaries InN and AIN as well as their ternary compounds have gained an unprecedented attention due to their wide-ranging applications encompassing green, blue, violet, and ultraviolet (UV) emitters and detectors (in photon ranges inaccessible by other semiconductors) and high-power amplifiers. However, even the best of the three binaries, GaN, contains many structural and point defects caused to a large extent by lattice and stacking mismatch with substrates. These defects notably affect the electrical and optical properties of the host material and can seriously degrade the performance and reliability of devices made based on these nitride semiconductors. Even though GaN broke the long-standing paradigm that high density of dislocations precludes acceptable device performance, point defects have taken the center stage as they exacerbate efforts to increase the efficiency of emitters, increase laser operation lifetime, and lead to anomalies in electronic devices. The point defects include native isolated defects (vacancies, interstitial, and antisites), intentional or unintentional impurities, as well as complexes involving different combinations of the isolated defects. Further improvements in device performance and longevity hinge on an in-depth understanding of point defects and their reduction. In this review a comprehensive and critical analysis of point defects in GaN, particularly their manifestation in luminescence, is presented. In addition to a comprehensive analysis of native point defects, the signatures of intentionally and unintentionally introduced impurities are addressed. The review discusses in detail the characteristics and the origin of the major luminescence bands including the ultraviolet, blue, green, yellow, and red bands in undoped GaN. The effects of important group-II impurities, such as Zn and Mg on the photoluminescence of GaN, are treated in detail. Similarly, but to a lesser extent, the effects of

  8. GaN as a radiation hard particle detector

    NASA Astrophysics Data System (ADS)

    Grant, J.; Bates, R.; Cunningham, W.; Blue, A.; Melone, J.; McEwan, F.; Vaitkus, J.; Gaubas, E.; O'Shea, V.

    2007-06-01

    Semiconductor tracking detectors at experiments such as ATLAS and LHCb at the CERN Large Hadron Collider (LHC) will be subjected to intense levels of radiation. The proposed machine upgrade, the Super-LHC (SLHC), to 10 times the initial luminosity of the LHC will require detectors that are ultra-radiation hard. Much of the current research into finding a detector that will meet the requirements of the SLHC has focused on using silicon substrates with enhanced levels of oxygen, for example Czochralski silicon and diffusion oxygenated float zone silicon, and into novel detector structures such as 3D devices. Another avenue currently being investigated is the use of wide band gap semiconductors such as silicon carbide (SiC) and gallium nitride (GaN). Both SiC and GaN should be intrinsically more radiation hard than silicon. Pad and guard ring structures were fabricated on three epitaxial GaN wafers. The epitaxial GaN thickness was either 2.5 or 12 μm and the fabricated detectors were irradiated to various fluences with 24 GeV/c protons and 1 MeV neutrons. Detectors were characterised pre- and post-irradiation by performing current-voltage ( I- V) and charge collection efficiency (CCE) measurements. Devices fabricated on 12 μm epitaxial GaN irradiated to fluences of 1016 protons cm-2 and 1016 neutrons cm-2 show maximum CCE values of 26% and 20%, respectively, compared to a maximum CCE of 53% of the unirradiated device.

  9. Wafer-scale epitaxial lift-off of optoelectronic grade GaN from a GaN substrate using a sacrificial ZnO interlayer

    NASA Astrophysics Data System (ADS)

    Rajan, Akhil; Rogers, David J.; Ton-That, Cuong; Zhu, Liangchen; Phillips, Matthew R.; Sundaram, Suresh; Gautier, Simon; Moudakir, Tarik; El-Gmili, Youssef; Ougazzaden, Abdallah; Sandana, Vinod E.; Teherani, Ferechteh H.; Bove, Philippe; Prior, Kevin A.; Djebbour, Zakaria; McClintock, Ryan; Razeghi, Manijeh

    2016-08-01

    Full 2 inch GaN epilayers were lifted off GaN and c-sapphire substrates by preferential chemical dissolution of sacrificial ZnO underlayers. Modification of the standard epitaxial lift-off (ELO) process by supporting the wax host with a glass substrate proved key in enabling full wafer scale-up. Scanning electron microscopy and x-ray diffraction confirmed that intact epitaxial GaN had been transferred to the glass host. Depth-resolved cathodoluminescence (CL) analysis of the bottom surface of the lifted-off GaN layer revealed strong near-band-edge (3.33 eV) emission indicating a superior optical quality for the GaN which was lifted off the GaN substrate. This modified ELO approach demonstrates that previous theories proposing that wax host curling was necessary to keep the ELO etch channel open do not apply to the GaN/ZnO system. The unprecedented full wafer transfer of epitaxial GaN to an alternative support by ELO offers the perspective of accelerating industrial adoption of the expensive GaN substrate through cost-reducing recycling.

  10. Fabrication and characterization of GaN nanowire doubly clamped resonators

    NASA Astrophysics Data System (ADS)

    Maliakkal, Carina B.; Mathew, John P.; Hatui, Nirupam; Rahman, A. Azizur; Deshmukh, Mandar M.; Bhattacharya, Arnab

    2015-09-01

    Gallium nitride (GaN) nanowires (NWs) have been intensely researched as building blocks for nanoscale electronic and photonic device applications; however, the mechanical properties of GaN nanostructures have not been explored in detail. The rigidity, thermal stability, and piezoelectric properties of GaN make it an interesting candidate for nano-electromechanical systems. We have fabricated doubly clamped GaN NW electromechanical resonators on sapphire using electron beam lithography and estimated the Young's modulus of GaN from resonance frequency measurements. For wires of triangular cross section with side ˜90 nm, we obtained values for the Young's modulus to be about 218 and 691 GPa, which are of the same order of magnitude as the values reported for bulk GaN. We also discuss the role of residual strain in the nanowire on the resonant frequency and the orientation dependence of the Young's modulus in wurtzite crystals.

  11. Growth of GaN micro/nanolaser arrays by chemical vapor deposition.

    PubMed

    Liu, Haitao; Zhang, Hanlu; Dong, Lin; Zhang, Yingjiu; Pan, Caofeng

    2016-09-01

    Optically pumped ultraviolet lasing at room temperature based on GaN microwire arrays with Fabry-Perot cavities is demonstrated. GaN microwires have been grown perpendicularly on c-GaN/sapphire substrates through simple catalyst-free chemical vapor deposition. The GaN microwires are [0001] oriented single-crystal structures with hexagonal cross sections, each with a diameter of ∼1 μm and a length of ∼15 μm. A possible growth mechanism of the vertical GaN microwire arrays is proposed. Furthermore, we report room-temperature lasing in optically pumped GaN microwire arrays based on the Fabry-Perot cavity. Photoluminescence spectra exhibit lasing typically at 372 nm with an excitation threshold of 410 kW cm(-2). The result indicates that these aligned GaN microwire arrays may offer promising prospects for ultraviolet-emitting micro/nanodevices. PMID:27454350

  12. Photo-induced Doping in GaN Epilayers with Graphene Quantum Dots

    PubMed Central

    Lin, T. N.; Inciong, M. R.; Santiago, S. R. M. S.; Yeh, T. W.; Yang, W. Y.; Yuan, C. T.; Shen, J. L.; Kuo, H. C.; Chiu, C. H.

    2016-01-01

    We demonstrate a new doping scheme where photo-induced carriers from graphene quantum dots (GQDs) can be injected into GaN and greatly enhance photoluminescence (PL) in GaN epilayers. An 8.3-fold enhancement of PL in GaN is observed after the doping. On the basis of time-resolved PL studies, the PL enhancement is attributed to the carrier transfer from GQDs to GaN. Such a carrier transfer process is caused by the work function difference between GQDs and GaN, which is verified by Kelvin probe measurements. We have also observed that photocurrent in GaN can be enhanced by 23-fold due to photo-induced doping with GQDs. The improved optical and transport properties from photo-induced doping are promising for applications in GaN-based optoelectronic devices. PMID:26987403

  13. Atomic-Level Study of Melting Behavior of GaN Nanotubes

    SciTech Connect

    Wang, Zhiguo; Zu, Xiaotao; Gao, Fei; Weber, William J.

    2006-09-20

    Molecular dynamics simulations with a Stillinger-Weber potential have been used to investigate the melting behavior of wurtzite-type single crystalline GaN nanotubes. The simulations show that the melting temperature of GaN nanotubes is much lower than that of bulk GaN, which may be associated with the large surface-to-volume ratio of the nanotubes. The melting temperature of the GaN nanotubes increases with the thickness of the nanotubes to a saturation value, which is close to the melting temperature of a GaN slab. The results reveal that the nanotubes begin to melt at the surface, and then the melting rapidly extends to the interior of the nanotubes as the temperature increases. The melting temperature of a single-crystalline GaN nanotube with [100]-oriented lateral facets is higher than that with [110]-oriented lateral facets for the same thickness.

  14. Photo-induced Doping in GaN Epilayers with Graphene Quantum Dots.

    PubMed

    Lin, T N; Inciong, M R; Santiago, S R M S; Yeh, T W; Yang, W Y; Yuan, C T; Shen, J L; Kuo, H C; Chiu, C H

    2016-01-01

    We demonstrate a new doping scheme where photo-induced carriers from graphene quantum dots (GQDs) can be injected into GaN and greatly enhance photoluminescence (PL) in GaN epilayers. An 8.3-fold enhancement of PL in GaN is observed after the doping. On the basis of time-resolved PL studies, the PL enhancement is attributed to the carrier transfer from GQDs to GaN. Such a carrier transfer process is caused by the work function difference between GQDs and GaN, which is verified by Kelvin probe measurements. We have also observed that photocurrent in GaN can be enhanced by 23-fold due to photo-induced doping with GQDs. The improved optical and transport properties from photo-induced doping are promising for applications in GaN-based optoelectronic devices. PMID:26987403

  15. Photo-induced Doping in GaN Epilayers with Graphene Quantum Dots

    NASA Astrophysics Data System (ADS)

    Lin, T. N.; Inciong, M. R.; Santiago, S. R. M. S.; Yeh, T. W.; Yang, W. Y.; Yuan, C. T.; Shen, J. L.; Kuo, H. C.; Chiu, C. H.

    2016-03-01

    We demonstrate a new doping scheme where photo-induced carriers from graphene quantum dots (GQDs) can be injected into GaN and greatly enhance photoluminescence (PL) in GaN epilayers. An 8.3-fold enhancement of PL in GaN is observed after the doping. On the basis of time-resolved PL studies, the PL enhancement is attributed to the carrier transfer from GQDs to GaN. Such a carrier transfer process is caused by the work function difference between GQDs and GaN, which is verified by Kelvin probe measurements. We have also observed that photocurrent in GaN can be enhanced by 23-fold due to photo-induced doping with GQDs. The improved optical and transport properties from photo-induced doping are promising for applications in GaN-based optoelectronic devices.

  16. Computational synthesis of single-layer GaN on refractory materials

    SciTech Connect

    Singh, Arunima K.; Hennig, Richard G.

    2014-08-04

    The synthesis of single-layer materials relies on suitable substrates. In this paper, we identify suitable substrates for the stabilization and growth of single-layer GaN and characterize the effect of the substrate on the electronic structure of single-layer GaN. We identify two classes of epitaxial substrates, refractory metal diborides and transition-metal dichalcogenides. We find that the refractory diborides provide epitaxial stabilization for the growth and functionalization of single layer GaN. We show that chemical interactions of single layer GaN with the diboride substrates result in n-type doping of the single-layer GaN. Transition-metal dichalcogenides, on the other hand, although epitaxially matched, cannot provide sufficient thermodynamic stabilization for the growth of single layer GaN. Nonetheless, energy band alignments of GaN/metal chalcogenides show that they make good candidates for heterostructures.

  17. Growth of GaN micro/nanolaser arrays by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Liu, Haitao; Zhang, Hanlu; Dong, Lin; Zhang, Yingjiu; Pan, Caofeng

    2016-09-01

    Optically pumped ultraviolet lasing at room temperature based on GaN microwire arrays with Fabry–Perot cavities is demonstrated. GaN microwires have been grown perpendicularly on c-GaN/sapphire substrates through simple catalyst-free chemical vapor deposition. The GaN microwires are [0001] oriented single-crystal structures with hexagonal cross sections, each with a diameter of ∼1 μm and a length of ∼15 μm. A possible growth mechanism of the vertical GaN microwire arrays is proposed. Furthermore, we report room-temperature lasing in optically pumped GaN microwire arrays based on the Fabry–Perot cavity. Photoluminescence spectra exhibit lasing typically at 372 nm with an excitation threshold of 410 kW cm‑2. The result indicates that these aligned GaN microwire arrays may offer promising prospects for ultraviolet-emitting micro/nanodevices.

  18. Fabrication and characterization of GaN nanowire doubly clamped resonators

    SciTech Connect

    Maliakkal, Carina B. Mathew, John P.; Hatui, Nirupam; Rahman, A. Azizur; Deshmukh, Mandar M.; Bhattacharya, Arnab

    2015-09-21

    Gallium nitride (GaN) nanowires (NWs) have been intensely researched as building blocks for nanoscale electronic and photonic device applications; however, the mechanical properties of GaN nanostructures have not been explored in detail. The rigidity, thermal stability, and piezoelectric properties of GaN make it an interesting candidate for nano-electromechanical systems. We have fabricated doubly clamped GaN NW electromechanical resonators on sapphire using electron beam lithography and estimated the Young's modulus of GaN from resonance frequency measurements. For wires of triangular cross section with side ∼90 nm, we obtained values for the Young's modulus to be about 218 and 691 GPa, which are of the same order of magnitude as the values reported for bulk GaN. We also discuss the role of residual strain in the nanowire on the resonant frequency and the orientation dependence of the Young's modulus in wurtzite crystals.

  19. Enhancing the field emission properties of Se-doped GaN nanowires

    NASA Astrophysics Data System (ADS)

    Li, Enling; Wu, Guishuang; Cui, Zhen; Ma, Deming; Shi, Wei; Wang, Xiaolin

    2016-07-01

    Pure and Se-doped GaN nanowires (NWs) are synthesized on Pt-coated Si(111) substrates via chemical vapor deposition. The GaN NWs exhibit a uniform density with an average diameter of 20–120 nm. The structure of the NWs is wurtzite hexagonal, and the growth direction is along [0001]. Field emission measurements show that the Se-doped GaN NWs possess a low turn-on field (2.9 V μm‑1) compared with the pure GaN NWs (7.0 V μm‑1). In addition, density functional theory calculations indicate that the donor states near the Fermi level are mainly formed through the hybridization between Se 4p and N 2p orbitals and that the Fermi level move towards the vacuum level. Consequently, the work functions of Se-doped GaN NWs are lower than those of pure GaN NWs.

  20. Study of radiation detection properties of GaN pn diode

    NASA Astrophysics Data System (ADS)

    Sugiura, Mutsuhito; Kushimoto, Maki; Mitsunari, Tadashi; Yamashita, Kohei; Honda, Yoshio; Amano, Hiroshi; Inoue, Yoku; Mimura, Hidenori; Aoki, Toru; Nakano, Takayuki

    2016-05-01

    Recently, GaN, which has remarkable properties as a material for optical devices and high-power electron devices, has also attracted attention as a material for radiation detectors. We previously suggested the use of BGaN as a neutron detector material. However, the radiation detection characteristics of GaN itself are not yet adequately understood. For realizing a BGaN neutron detector, the understanding of the radiation detection characteristics of GaN, which is a base material of the neutron detector, is important. In this study, we evaluated the radiation detection characteristics of GaN. We performed I-V and energy spectrum measurements under alpha ray, gamma ray, and thermal neutron irradiations to characterize the radiation detection characteristics of a GaN diode. The obtained results indicate that GaN is an effective material for our proposed new BGaN-based neutron detector.

  1. 7 CFR 11.22 - Functions.

    Code of Federal Regulations, 2014 CFR

    2014-01-01

    .... (a) Director. Provides executive direction for NAD. The Director is responsible for developing and... respond to all FOIA requests concerning appeal decisions and case records maintained by NAD. (b) Deputy Director for Hearings and Administration. Responsible for all administrative functions of NAD,...

  2. 7 CFR 11.22 - Functions.

    Code of Federal Regulations, 2010 CFR

    2010-01-01

    .... (a) Director. Provides executive direction for NAD. The Director is responsible for developing and... respond to all FOIA requests concerning appeal decisions and case records maintained by NAD. (b) Deputy Director for Hearings and Administration. Responsible for all administrative functions of NAD,...

  3. 7 CFR 11.22 - Functions.

    Code of Federal Regulations, 2011 CFR

    2011-01-01

    .... (a) Director. Provides executive direction for NAD. The Director is responsible for developing and... respond to all FOIA requests concerning appeal decisions and case records maintained by NAD. (b) Deputy Director for Hearings and Administration. Responsible for all administrative functions of NAD,...

  4. 7 CFR 11.22 - Functions.

    Code of Federal Regulations, 2012 CFR

    2012-01-01

    .... (a) Director. Provides executive direction for NAD. The Director is responsible for developing and... respond to all FOIA requests concerning appeal decisions and case records maintained by NAD. (b) Deputy Director for Hearings and Administration. Responsible for all administrative functions of NAD,...

  5. 7 CFR 11.22 - Functions.

    Code of Federal Regulations, 2013 CFR

    2013-01-01

    .... (a) Director. Provides executive direction for NAD. The Director is responsible for developing and... respond to all FOIA requests concerning appeal decisions and case records maintained by NAD. (b) Deputy Director for Hearings and Administration. Responsible for all administrative functions of NAD,...

  6. Gas source molecular beam epitaxy of GaN with hydrazine on spinel substrates

    NASA Astrophysics Data System (ADS)

    Nikishin, S. A.; Temkin, H.; Antipov, V. G.; Guriev, A. I.; Zubrilov, A. S.; Elyukhin, V. A.; Faleev, N. N.; Kyutt, R. N.; Chin, A. K.

    1998-05-01

    Growth of high quality wurtzite-structure GaN layers on (111) MgAl2O4 by gas source molecular beam epitaxy is described. Hydrazine was used as a source of active nitrogen. In situ reflection high energy electron diffraction was used to monitor the growth mode. Two-dimensional growth was obtained at temperatures above 750 °C on multi-step GaN buffer layers. The resulting GaN films show excellent luminescence properties.

  7. Graphene oxide assisted synthesis of GaN nanostructures for reducing cell adhesion

    NASA Astrophysics Data System (ADS)

    Yang, Rong; Zhang, Ying; Li, Jingying; Han, Qiusen; Zhang, Wei; Lu, Chao; Yang, Yanlian; Dong, Hongwei; Wang, Chen

    2013-10-01

    We report a general approach for the synthesis of large-scale gallium nitride (GaN) nanostructures by the graphene oxide (GO) assisted chemical vapor deposition (CVD) method. A modulation effect of GaN nanostructures on cell adhesion has been observed. The morphology of the GaN surface can be controlled by GO concentrations. This approach, which is based on the predictable choice of the ratio of GO to catalysts, can be readily extended to the synthesis of other materials with controllable nanostructures. Cell studies show that GaN nanostructures reduced cell adhesion significantly compared to GaN flat surfaces. The cell-repelling property is related to the nanostructure and surface wettability. These observations of the modulation effect on cell behaviors suggest new opportunities for novel GaN nanomaterial-based biomedical devices. We believe that potential applications will emerge in the biomedical and biotechnological fields.We report a general approach for the synthesis of large-scale gallium nitride (GaN) nanostructures by the graphene oxide (GO) assisted chemical vapor deposition (CVD) method. A modulation effect of GaN nanostructures on cell adhesion has been observed. The morphology of the GaN surface can be controlled by GO concentrations. This approach, which is based on the predictable choice of the ratio of GO to catalysts, can be readily extended to the synthesis of other materials with controllable nanostructures. Cell studies show that GaN nanostructures reduced cell adhesion significantly compared to GaN flat surfaces. The cell-repelling property is related to the nanostructure and surface wettability. These observations of the modulation effect on cell behaviors suggest new opportunities for novel GaN nanomaterial-based biomedical devices. We believe that potential applications will emerge in the biomedical and biotechnological fields. Electronic supplementary information (ESI) available. See DOI: 10.1039/c3nr02770h

  8. Partial strain relaxation effects on polarization anisotropy of semipolar (112{sup ¯}2) InGaN/GaN quantum well structures

    SciTech Connect

    Park, Seoung-Hwan; Mishra, Dhaneshwar; Eugene Pak, Y.; Young Park, Chang; Yoo, Seung-Hyun; Cho, Yong-Hee; Shim, Mun-Bo; Hwang, Sangheum; Kim, Sungjin

    2013-11-25

    Partial strain relaxation effects on polarization anisotropy of semipolar (112{sup ¯}2) InGaN/GaN quantum well (QW) structures were investigated using the multiband effective-mass theory. In the case of strain relaxation of ϵ{sub x′x′} along x′-axis, the polarization ratio gradually decreases with increasing strain relaxation. Also, with the strain relaxation by the same amount, the variation of the polarization ratio along x′-axis is shown to be much larger than that along y′-axis. However, the polarization switching is not observed even at a high In composition of 0.4 due to a small strain component (ϵ{sub x′x′}{sup 0}) with no strain relaxation. On the other hand, in the case of strain relaxation of ϵ{sub y′y′} along y′-axis, the polarization switching is observed, and the optical anisotropy is found to change from positive to negative with increasing strain relaxation. Also, the absolute value of the polarization ratio gradually decreases with increasing carrier density. However, the polarization switching due to the carrier density is not observed. Thus, the polarization switching observed at high carrier density may be attributed to inhomogeneous strain distribution in the InGaN layer.

  9. Structural defects in GaN revealed by Transmission Electron Microscopy

    DOE PAGESBeta

    Liliental-Weber, Zuzanna

    2014-09-08

    This paper reviews the various types of structural defects observed by Transmission Electron Microscopy in GaN heteroepitaxial layers grown on foreign substrates and homoepitaxial layers grown on bulk GaN substrates. The structural perfection of these layers is compared to the platelet self-standing crystals grown by High Nitrogen Pressure Solution. Defects in undoped and Mg doped GaN are discussed. Lastly, some models explaining the formation of inversion domains in heavily Mg doped layers that are possible defects responsible for the difficulties of p-doping in GaN are also reviewed.

  10. Structural defects in GaN revealed by Transmission Electron Microscopy

    SciTech Connect

    Liliental-Weber, Zuzanna

    2014-04-18

    This paper reviews the various types of structural defects observed by Transmission Electron Microscopy in GaN heteroepitaxial layers grown on foreign substrates and homoepitaxial layers grown on bulk GaN substrates. The structural perfection of these layers is compared to the platelet self-standing crystals grown by High Nitrogen Pressure Solution. Defects in undoped and Mg doped GaN are discussed. Some models explaining the formation of inversion domains in heavily Mg doped layers that are possible defects responsible for the difficulties of p-doping in GaN are also reviewed.

  11. Cathodoluminescence of GaN implanted with Sm and Ho

    SciTech Connect

    Lozykowski, H.J.; Jadwisienczak, W.M.; Brown, I.

    1999-04-01

    We report the first observation of visible cathodoluminescence of the rare earth (RE) elements Sm, Ho implanted in GaN. The implanted samples were given isochronal thermal annealing treatments at a temperature of 1100 degrees C in N2, at atmospheric pressure to recover implantation damages and activate the RE ions. The sharp characteristic emission lines corresponding to Sm{sup 3+} and Ho{sup 3+} intra-4f{sup n}-shell transitions are resolved in the spectral range from 400 to 1000 nm, and observed over the temperature range of 11-411 K. The cathodoluminescence emission is only weakly temperature dependent. The results indicate that RE doped GaN epilayers are suitable as a material for visible optoelectronic devices.

  12. Hydrogen-dependent lattice dilation in GaN

    NASA Astrophysics Data System (ADS)

    Zhang, Jian-Ping; Wang, Xiao-Liang; Sun, Dian-Zhao; Kong, Mei-Ying

    2000-06-01

    Using Raman spectroscopy we have analysed the strain status of GaN films grown on sapphire substrates by NH3 source molecular beam epitaxy (MBE). In addition to the expected compressive biaxial strain, in some cases GaN films grown on c-face sapphire substrates suffer from serious tensile biaxial strain. This anomalous behaviour has been well interpreted in terms of interstitial hydrogen-dependent lattice dilation. The hydrogen concentration in the films is measured by nuclear reaction analysis (NRA). With increasing hydrogen incorporation, the residual compressive biaxial strain is first further relaxed, and then turns into tensile strain when the hydrogen contaminant exceeds a critical concentration. The hydrogen incorporation during the growth process is found to be growth-rate dependent, and is supposed to be strain driven. We believe that the strain-induced interstitial incorporation is another way for strain relaxation during heteroepitaxy, besides the two currently well known mechanisms: formation of dislocations and growth front roughening.

  13. Anharmonic phonon decay in cubic GaN

    NASA Astrophysics Data System (ADS)

    Cuscó, R.; Domènech-Amador, N.; Novikov, S.; Foxon, C. T.; Artús, L.

    2015-08-01

    We present a Raman-scattering study of optical phonons in zinc-blende (cubic) GaN for temperatures ranging from 80 to 750 K. The experiments were performed on high-quality, cubic GaN films grown by molecular-beam epitaxy on GaAs (001) substrates. The observed temperature dependence of the optical phonon frequencies and linewidths is analyzed in the framework of anharmonic decay theory, and possible decay channels are discussed in the light of density-functional-theory calculations. The longitudinal-optical (LO) mode relaxation is found to occur via asymmetric decay into acoustic phonons, with an appreciable contribution of higher-order processes. The transverse-optical mode linewidth shows a weak temperature dependence and its frequency downshift is primarily determined by the lattice thermal expansion. The LO phonon lifetime is derived from the observed Raman linewidth and an excellent agreement with previous theoretical predictions is found.

  14. High-Temperature Growth of GaN Single Crystals Using Li-Added Na-Flux Method

    NASA Astrophysics Data System (ADS)

    Honjo, Masatomo; Imabayashi, Hiroki; Takazawa, Hideo; Todoroki, Yuma; Matsuo, Daisuke; Murakami, Kosuke; Maruyama, Mihoko; Imade, Mamoru; Yoshimura, Masashi; Sasaki, Takatomo; Mori, Yusuke

    2012-12-01

    The Na-flux method is a promising for fabricating GaN crystals with high quality. In our previous study, we found that the surface morphology and transparency of these crystals were improved by raising the growth temperature. Increasing the threshold pressure of nitrogen for GaN growth, however, made GaN growth at high temperatures difficult. In this study, we attempted to grow GaN crystals by the Na-flux method with the addition of Li to the flux, which promoted the solubility of nitrogen in the flux. As a result, the threshold pressure of nitrogen for GaN growth decreased, and GaN crystals with high crystallinity were grown at 900 °C. In addition, we found that the crystallinity of the grown GaN crystals was improved and the concentration of impurities in the grown GaN crystals was decreased by raising the growth temperature.

  15. Positron annihilation in AlN and GaN

    NASA Astrophysics Data System (ADS)

    Arutyunov, N. Yu.; Emtsev, V. V.; Mikhailin, A. V.; Davidov, V. Yu.

    2001-12-01

    The measurements of one-dimensional angular correlation of the annihilation radiation (1D-ACAR) have been carried out for AlN and GaN as well as for some related materials (Al, Ga, GaP, GaAs, GaSb) which have been used as samples of references the analysis of results. The numeral values of characteristic length of radius of spherical volume to be occupied by annihilating electron ( rs‧) have differed significantly from the corresponding values ( rs) calculated by the conventional independent-particle-model (IPM) for ideal Fermi-gas: rs‧ (AlN)≃1.28 rs, where rs (AlN)≃1.61 a.u., and rs‧ (GaN)≃1.66 rs, where rs (GaN)≃1.64 a.u. The electron-positron “ion radii” reconstructed by the high-momentum components (HMC) of 1D-ACAR for Al 3+, Ga 3+ cores as well as numeral rs‧ values provide some reasons to believe that Ga- and Al-vacancies and their impurity complexes are effective centers of the positron localization in AlN and GaN; it is assumed that these complexes include V Ga, V Al, and N atom (V Ga-N Ga in GaN and V Al-N Al in AlN) where the nitrogen atom is likely to be in the configuration of substitution (anti-site), N +Ga and N +Al, respectively.

  16. GaN blue diode lasers: a spectroscopist's view

    NASA Astrophysics Data System (ADS)

    Leinen, H.; Glässner, D.; Metcalf, H.; Wynands, R.; Haubrich, D.; Meschede, D.

    We have characterized the spectroscopic properties of one of the first samples of blue-emitting diode lasers based on GaN. With such a laser diode operated inside a standard extended cavity arrangement we find a mode-hop free tuning range of more than 20 GHz and a linewidth of 10 MHz. Doppler-free spectroscopy on an indium atomic beam reveals the isotope shift between the two major indium isotopes as well as efficient optical pumping.

  17. Photoluminescence of ion-implanted GaN

    NASA Technical Reports Server (NTRS)

    Pankove, J. I.; Hutchby, J. A.

    1976-01-01

    Thirty-five elements were implanted in GaN. Their photoluminescence spectra were measured and compared to those of an unimplanted control sample. Most impurities emit a peak at about 2.15 eV. Mg, Zn, Cd, Ca, As, Hg, and Ag have more characteristic emissions. Zn provides the most efficient recombination center. A set of midgap states is generated during the damage-annealing treatment.

  18. Ammonothermal bulk GaN substrates for LEDs

    NASA Astrophysics Data System (ADS)

    Jiang, W.; Ehrentraut, D.; Kamber, D. S.; Downey, B. C.; Cook, J.; Grundmann, M.; Pakalapati, R. T.; Yoo, H.; D'Evelyn, M. P.

    2014-02-01

    Soraa has developed a novel ammonothermal approach for growth of high quality, true bulk GaN crystals at a greatly reduced cost. Soraa's patented approach, known as SCoRA (Scalable Compact Rapid Ammonothermal) utilizes internal heating to circumvent the material-property limitations of conventional ammonothermal reactors. The SCoRA reactor has capability for temperatures and pressures greater than 650 °C and 500 MPa, respectively, enabling higher growth rates than conventional ammonothermal techniques, yet is less expensive and more scalable than conventional autoclaves fabricated from nickel-based superalloys. SCoRA GaN growth has been performed on c-plane and m-plane seed crystals with diameters between 5 mm and 2" to thicknesses of 0.5-4 mm. The highest growth rates are greater than 40 μm/h and rates in the 10-30 μm/h range are routinely observed. These values are significantly larger than those achieved by conventional ammonothermal GaN growth and are sufficient for a cost-effective manufacturing process. Two-inch diameter, crack-free, free-standing, n-type bulk GaN crystals have been grown. The crystals have been characterized by a range of techniques, including x-ray diffraction rocking-curve (XRC) analysis, optical microscopy, cathodoluminescence (CL), optical spectroscopy, and capacitance-voltage measurements. The crystallinity of the grown crystals is very good, with FWHM values of 15-80 arc-sec and average dislocation densities below 5 x 105 cm-2.

  19. Thermal functionalization of GaN surfaces with 1-alkenes.

    PubMed

    Schwarz, Stefan U; Cimalla, Volker; Eichapfel, Georg; Himmerlich, Marcel; Krischok, Stefan; Ambacher, Oliver

    2013-05-28

    A thermally induced functionalization process for gallium nitride surfaces with 1-alkenes is introduced. The resulting functionalization layers are characterized with atomic force microscopy and X-ray photoelectron spectroscopy and compared to reference samples without and with a photochemically generated functionalization layer. The resulting layers show very promising characteristics as functionalization for GaN based biosensors. On the basis of the experimental results, important characteristics of the functionalization layers are estimated and a possible chemical reaction scheme is proposed. PMID:23617559

  20. Ca and O ion implantation doping of GaN

    SciTech Connect

    Zolper, J.C.; Wilson, R.G.; Pearton, S.J.; Stall, R.A.

    1996-04-01

    {ital p}- and {ital n}-type doping of GaN have been realized by ion implantation of Ca and O, respectively. Rapid thermal annealing at 1100{degree}C or higher is required to achieve {ital p}-type conduction in Ca or Ca+P implanted samples with an estimated ionization level of 169 meV and a corresponding activation efficiency of {approximately}100{percent}. This is the first experimental report of an acceptor species in GaN, other than Mg, with an ionization energy level less than 180 meV. O-implanted GaN displays an ionization level of {approximately}29 meV but with an activation efficiency of only 3.6{percent} after a 1050{degree}C anneal that may result from insufficient vacancy generation for the lighter O ion or from the existence of a second, deeper O energy level. Neither Ca or O displayed measurable redistribution, based on secondary ion mass spectrometry measurements, even after a 1125{degree}C anneal. {copyright} {ital 1996 American Institute of Physics.}

  1. In situ nanomechanics of GaN nanowires.

    PubMed

    Huang, Jian Yu; Zheng, He; Mao, S X; Li, Qiming; Wang, George T

    2011-04-13

    The deformation, fracture mechanisms, and the fracture strength of individual GaN nanowires were measured in real time using a transmission electron microscope-scanning probe microscope (TEM-SPM) platform. Surface mediated plasticity, such as dislocation nucleation from a free surface and plastic deformation between the SPM probe (the punch) and the nanowire contact surface were observed in situ. Although local plasticity was observed frequently, global plasticity was not observed, indicating the overall brittle nature of this material. Dislocation nucleation and propagation is a precursor before the fracture event, but the fracture surface shows brittle characteristic. The fracture surface is not straight but kinked at (10-10) or (10-11) planes. Dislocations are generated at a stress near the fracture strength of the nanowire, which ranges from 0.21 to 1.76 GPa. The results assess the mechanical properties of GaN nanowires and may provide important insight into the design of GaN nanowire devices for electronic and optoelectronic applications. PMID:21417390

  2. UV-Photoassisted Etching of GaN in KOH

    SciTech Connect

    Abernathy, C.R.; Auh, K.H.; Cho, H.; Donovan, S.M.; Han, J.; Lambers, E.S.; Pearton, S.J.; Ren F.; Shul, R.J.

    1998-11-12

    The etch rate of GaN under W-assisted photoelectrochemical conditions in KOH solutions is found to be a strong function of illumination intensity, solution molarity, sample bias and material doping level. At low e-h pair generation rates, grain boundaries are selectively etched, while at higher illumination intensities etch rates for unintentionally doped (n - 3x 10^12Gcm-3) GaN are 2 1000 .min-l. The etching is diffusion limited under our conditions with an activation energy of - 0.8kCal.mol-1. The etched surfaces are rough, but retain their stoichiometry. PEC etching is found to selectively reveal grain boundaries in GaN under low light illumination conditions. At high lamp powers the rates increase with sample temperature and the application of bias to the PEC cell, while they go through a maximum with KOH solution molarity. The etching is diffusion-limited, producing rough surface morphologies that are suitable in a limited number of device fabrication steps. The surfaces however appear to remain relatively close to their stoichiometric composition.

  3. Oxidation of GaN: An ab initio thermodynamic approach

    NASA Astrophysics Data System (ADS)

    Jackson, Adam J.; Walsh, Aron

    2013-10-01

    GaN is a wide-band-gap semiconductor used in high-efficiency light-emitting diodes and solar cells. The solid is produced industrially at high chemical purities by deposition from a vapor phase, and oxygen may be included at this stage. Oxidation represents a potential path for tuning its properties without introducing more exotic elements or extreme processing conditions. In this work, ab initio computational methods are used to examine the energy potentials and electronic properties of different extents of oxidation in GaN. Solid-state vibrational properties of Ga, GaN, Ga2O3, and a single substitutional oxygen defect have been studied using the harmonic approximation with supercells. A thermodynamic model is outlined which combines the results of ab initio calculations with data from experimental literature. This model allows free energies to be predicted for arbitrary reaction conditions within a wide process envelope. It is shown that complete oxidation is favorable for all industrially relevant conditions, while the formation of defects can be opposed by the use of high temperatures and a high N2:O2 ratio.

  4. Theoretical and Experiment Study of Cathodoluminescence of GaN

    NASA Astrophysics Data System (ADS)

    Ben Nasr, F.; Matoussi, A.; Salh, R.; Boufaden, T.; Guermazi, S.; Fitting, H.-J.; Eljani, B.; Fakhfakh, Z.

    2007-09-01

    In this work, we report the theoretical and experimental results of cathodoluminescence (CL) from GaN layers with thickness (1-3) micron grown at 800 °C by MOVPE on silicon substrate. The CL measurements were performed in a digital scanning electron microscope DSM 960 at room temperature. The CL spectra recorded at room temperature (RT) show the main UV peak at 3.42 eV of the fundamental transition and a broad yellow band at 2.2 eV attributed the intrinsic defects and extrinsic dopants and impurities. The simulation of the CL excitation and intensity is developed using consistent 2-D model based on the electron beam energy dissipation and taking into account the effects of carrier diffusion, internal absorption and the recombination processes in GaN. Then, we have investigated the evolution of the CL intensity from GaN as a function the electron beam energy in the range Eo = (5-20) keV. A comparative study between experimental and simulated CL spectra at room temperature is presented.

  5. Epitaxially-Grown GaN Junction Field Effect Transistors

    SciTech Connect

    Baca, A.G.; Chang, P.C.; Denbaars, S.P.; Lester, L.F.; Mishra, U.K.; Shul, R.J.; Willison, C.G.; Zhang, L.; Zolper, J.C.

    1999-05-19

    Junction field effect transistors (JFET) are fabricated on a GaN epitaxial structure grown by metal organic chemical vapor deposition (MOCVD). The DC and microwave characteristics of the device are presented. A junction breakdown voltage of 56 V is obtained corresponding to the theoretical limit of the breakdown field in GaN for the doping levels used. A maximum extrinsic transconductance (gm) of 48 mS/mm and a maximum source-drain current of 270 mA/mm are achieved on a 0.8 µ m gate JFET device at VGS= 1 V and VDS=15 V. The intrinsic transconductance, calculated from the measured gm and the source series resistance, is 81 mS/mm. The fT and fmax for these devices are 6 GHz and 12 GHz, respectively. These JFETs exhibit a significant current reduction after a high drain bias is applied, which is attributed to a partially depleted channel caused by trapped hot-electrons in the semi-insulating GaN buffer layer. A theoretical model describing the current collapse is described, and an estimate for the length of the trapped electron region is given.

  6. Pit assisted oxygen chemisorption on GaN surfaces.

    PubMed

    Mishra, Monu; Krishna T C, Shibin; Aggarwal, Neha; Kaur, Mandeep; Singh, Sandeep; Gupta, Govind

    2015-06-21

    A comprehensive analysis of oxygen chemisorption on epitaxial gallium nitride (GaN) films grown at different substrate temperatures via RF-molecular beam epitaxy was carried out. Photoemission (XPS and UPS) measurements were performed to investigate the nature of the surface oxide and corresponding changes in the electronic structure. It was observed that the growth of GaN films at lower temperatures leads to a lower amount of surface oxide and vice versa was observed for a higher temperature growth. The XPS core level (CL) and valence band maximum (VBM) positions shifted towards higher binding energies (BE) with oxide coverage and revealed a downward band bending. XPS valence band spectra were de-convoluted to understand the nature of the hybridization states. UPS analysis divulged higher values of electronic affinity and ionization energy for GaN films grown at a higher substrate temperature. The surface morphology and pit structure were probed via microscopic measurements (FESEM and AFM). FESEM and AFM analysis revealed that the film surface was covered with hexagonal pits, which played a significant role in oxygen chemisorption. The favourable energetics of the pits offered an ideal site for oxygen adsorption. Pit density and pit depth were observed to be important parameters that governed the surface oxide coverage. The contribution of surface oxide was increased with an increase in average pit density as well as pit depth. PMID:25991084

  7. Dislocation core structures in Si-doped GaN

    SciTech Connect

    Rhode, S. L. Fu, W. Y.; Sahonta, S.-L.; Kappers, M. J.; Humphreys, C. J.; Horton, M. K.; Pennycook, T. J.; Dusane, R. O.; Moram, M. A.

    2015-12-14

    Aberration-corrected scanning transmission electron microscopy was used to investigate the core structures of threading dislocations in plan-view geometry of GaN films with a range of Si-doping levels and dislocation densities ranging between (5 ± 1) × 10{sup 8} and (10 ± 1) × 10{sup 9} cm{sup −2}. All a-type (edge) dislocation core structures in all samples formed 5/7-atom ring core structures, whereas all (a + c)-type (mixed) dislocations formed either double 5/6-atom, dissociated 7/4/8/4/9-atom, or dissociated 7/4/8/4/8/4/9-atom core structures. This shows that Si-doping does not affect threading dislocation core structures in GaN. However, electron beam damage at 300 keV produces 4-atom ring structures for (a + c)-type cores in Si-doped GaN.

  8. Understanding the pyramidal growth of GaN

    SciTech Connect

    Rouviere, J.L.; Arlery, M.; Bourret, A.

    1996-11-01

    By a combination of conventional, HREM and CBED TEM experiments the authors have studied wurtzite GaN layers grown by Metal-Organic Chemical Vapor Deposition (MOCVD) on (0001)Al{sub 2}O{sub 3}. They experimentally determine the structure of the macroscopic hexagonal pyramids that are visible at the surface of the layers when no optimized buffer is introduced. These pyramids look like hexagonal volcanoes with one hexagonal microscopic chimney (up to 75 nm wide) at their core. The crystal inside the chimney is a pure GaN crystal with a polarity opposed to the one of the neighboring material: the GaN layers grown on (0001)Al{sub 2}O{sub 3} are everywhere Ga-terminated except in the chimneys where they are N-terminated. Some of the N-terminated chimneys grow faster and form macroscopic hexagonal pyramids. Chimneys bounded by Inversion Domains Boundaries (IDBs) originate from steps at the surface of the substrate and may be suppressed by an adapted buffer layer.

  9. Magnesium diffusion profile in GaN grown by MOVPE

    NASA Astrophysics Data System (ADS)

    Benzarti, Z.; Halidou, I.; Bougrioua, Z.; Boufaden, T.; El Jani, B.

    2008-07-01

    The diffusion of magnesium has been studied in GaN layers grown on sapphire substrate by atmospheric pressure metalorganic vapor-phase-epitaxy (MOVPE) in a "home-made" reactor. Secondary Ion Mass Spectroscopy (SIMS) was used to visualise the Mg profiles in two kinds of multi-sublayer GaN structures. One structure was grown with a variable flow of Ga precursor (TMG) and the second one with a variable growth temperature. In both cases, the Mg dopant precursor (Cp 2Mg) flow was kept constant. Using the second Fick's law to fit the experimental SIMS data, we have deduced an increasing then a saturating Mg diffusion coefficient versus the Mg concentration. Mg incorporation was found to get higher for lower growth rate, i.e. when TMG flow is reduced. Furthermore, based on the temperature-related behaviour we have found that the activation energy for Mg diffusion coefficient in GaN was 1.9 eV. It is suggested that Mg diffuses via substitutional sites.

  10. Self-assembled GaN nanowires on diamond.

    PubMed

    Schuster, Fabian; Furtmayr, Florian; Zamani, Reza; Magén, Cesar; Morante, Joan R; Arbiol, Jordi; Garrido, Jose A; Stutzmann, Martin

    2012-05-01

    We demonstrate the nucleation of self-assembled, epitaxial GaN nanowires (NWs) on (111) single-crystalline diamond without using a catalyst or buffer layer. The NWs show an excellent crystalline quality of the wurtzite crystal structure with m-plane faceting, a low defect density, and axial growth along the c-axis with N-face polarity, as shown by aberration corrected annular bright-field scanning transmission electron microscopy. X-ray diffraction confirms single domain growth with an in-plane epitaxial relationship of (10 ̅10)(GaN) [parallel] (01 ̅1)(Diamond) as well as some biaxial tensile strain induced by thermal expansion mismatch. In photoluminescence, a strong and sharp excitonic emission reveals excellent optical properties superior to state-of-the-art GaN NWs on silicon substrates. In combination with the high-quality diamond/NW interface, confirmed by high-resolution transmission electron microscopy measurements, these results underline the potential of p-type diamond/n-type nitride heterojunctions for efficient UV optoelectronic devices. PMID:22506554

  11. Metal contacts on ZnSe and GaN

    SciTech Connect

    Duxstad, K J

    1997-05-01

    Recently, considerable interest has been focused on the development of blue light emitting materials and devices. The focus has been on GaN and ZnSe, direct band gap semiconductors with bands gaps of 3.4 and 2.6 eV, respectively. To have efficient, reliable devices it is necessary to have thermally and electrically stable Ohmic contacts. This requires knowledge of the metal-semiconductor reaction behavior. To date few studies have investigated this behavior. Much information has accumulated over the years on the behavior of metals on Si and GaAs. This thesis provides new knowledge for the more ionic wide band gap semiconductors. The initial reaction temperatures, first phases formed, and phase stability of Pt, Pd, and Ni on both semiconductors were investigated. The reactions of these metals on ZnSe and GaN are discussed in detail and correlated with predicted behavior. In addition, comparisons are made between these highly ionic semiconductors and Si and GaAs. The trends observed here should also be applicable to other II-VI and III-Nitride semiconductor systems, while the information on phase formation and stability should be useful in the development of contacts for ZnSe and GaN devices.

  12. Fabrication of GaN structures with embedded network of voids using pillar patterned GaN templates

    NASA Astrophysics Data System (ADS)

    Svensk, O.; Ali, M.; Riuttanen, L.; Törmä, P. T.; Sintonen, S.; Suihkonen, S.; Sopanen, M.; Lipsanen, H.

    2013-05-01

    In this paper we report on the MOCVD growth and characterization of GaN structures and InGaN single quantum wells grown on pillar patterned GaN/sapphire templates. During the regrowth a network of voids was intentionally formed at the interface of sapphire substrate and GaN epitaxial layer. The regrowth process was found to decrease the threading dislocation density of the overgrown layer. The quantum well sample grown on patterned template showed significantly higher optical output in photoluminescence measurements compared to the reference sample with identical internal quantum efficiency characteristics. We attribute the increase to enhanced light extraction efficiency caused by strong scattering and redirection of light from the scattering elements.

  13. Opportunities and challenges in GaN metal organic chemical vapor deposition for electron devices

    NASA Astrophysics Data System (ADS)

    Matsumoto, Koh; Yamaoka, Yuya; Ubukata, Akinori; Arimura, Tadanobu; Piao, Guanxi; Yano, Yoshiki; Tokunaga, Hiroki; Tabuchi, Toshiya

    2016-05-01

    The current situation and next challenge in GaN metal organic chemical vapor deposition (MOCVD) for electron devices of both GaN on Si and GaN on GaN are presented. We have examined the possibility of increasing the growth rate of GaN on 200-mm-diameter Si by using a multiwafer production MOCVD machine, in which the vapor phase parasitic reaction is well controlled. The impact of a high-growth-rate strained-layer-superlattice (SLS) buffer layer is presented in terms of material properties. An SLS growth rate of as high as 3.46 µm/h, which was 73% higher than the current optimum, was demonstrated. As a result, comparable material properties were obtained. Next, a typical result of GaN doped with Si of 1 × 1016 cm‑3 grown at the growth rate of 3.7 µm/h is shown. For high-voltage application, we need a thick high-purity GaN drift layer with a low carbon concentration, of less than 1016 cm‑3. It is shown that achieving a high growth rate by precise control of the vapor phase reaction is still challenge in GaN MOCVD.

  14. Nanoheteroepitaxy of GaN on AlN/Si(111) nanorods fabricated by nanosphere lithography

    NASA Astrophysics Data System (ADS)

    Lee, Donghyun; Shin, In-Su; Jin, Lu; Kim, Donghyun; Park, Yongjo; Yoon, Euijoon

    2016-06-01

    Nanoheteroepitaxy (NHE) of GaN on an AlN/Si(111) nanorod structure was investigated by metal-organic chemical vapor deposition. Silica nanosphere lithography was employed to fabricate a periodic hexagonal nanorod array with a narrow gap of 30 nm between the nanorods. We were successful in obtaining a fully coalesced GaN film on the AlN/Si(111) nanorod structure. Transmission electron microscopy revealed that threading dislocation (TD) bending and termination by stacking faults occurred near the interface between GaN and the AlN/Si(111) nanorods, resulting in the reduction of TD density for the NHE GaN layer. The full width at half-maximum of the X-ray rocking curve for (102) plane of the NHE GaN was found to decrease down to 728 arcsec from 1005 arcsec for the GaN layer on a planar AlN/Si(111) substrate, indicating that the crystalline quality of the NHE GaN was improved. Also, micro-Raman measurement showed that tensile stress in the NHE GaN layer was reduced significantly as much as 70% by introducing air voids between the nanorods.

  15. Preparation and characterization of one-dimensional GaN nanorods with Tb intermediate layer

    SciTech Connect

    Shi, Feng; Xue, Chengshan

    2012-12-15

    Graphical abstract: Display Omitted Highlights: ► GaN nanorods have been prepared on Si substrates by magnetron sputtering. ► GaN nanorods are single crystal with hexagonal wurtzite structure. ► GaN nanorods are high-quality crystalline after ammoniating at 950 °C for 15 min. ► Ammoniating temperatures and times affect the growth of GaN nanorods significantly. -- Abstract: GaN nanorods have been successfully prepared on Si(1 1 1) substrates by magnetron sputtering through ammoniating Ga{sub 2}O{sub 3}/Tb thin films. X-ray diffraction (XRD), X-ray photoelectron spectroscope (XPS), FT-IR spectrophotometer, scanning electron microscope (SEM), high-resolution transmission electron microscope (HRTEM), and photoluminescence (PL) spectroscopy were used to characterize the microstructures, morphologies compositions and optical properties of the GaN samples. The results demonstrate that the nanorods are single crystal GaN with hexagonal wurtzite structure and high-quality crystalline after ammoniating at 950 °C for 15 min, which have the size of 100–150 nm in diameter. Ammoniating temperatures and times affect the growth of GaN nanorods significantly. The growth procedure mainly follows the Tb catalyst-assisted VLS mechanism.

  16. Terahertz study of m-plane GaN thin fims

    NASA Astrophysics Data System (ADS)

    Quadir, Shaham; Jang, Der-Jun; Lin, Ching-Liang; Lo, Ikai

    2014-03-01

    We investigate the optical properties of m-plane GaN thin films using the terahertz time domain spectroscopy. The m-plane GaN thin films were grown on γ-LiAlO2 substrates with buffer layers of low temperature grown GaN. The thin films were illuminated with terahertz radiation generated by a LT-GaAs antenna and the transmitted signal was detected by a ZnTe crystal. The polarization of the terahertz wave was chosen to be either parallel or perpendicular to the GaN [0001] direction. We compared the transmitted signals of the m-plane GaN thin films to that of the LAO substrate. The samples as well as the LAO substrate exhibited polarization dependence of absorption in terahertz spectrum. The carrier densities and the mobilities were derived from the transmittance of the THz wave using extended Drude model. We found, in all samples, both the carrier densities and mobilities along the GaN [0001] direction were smaller than those along the GaN [1120] direction due to the stripe formation along the GaN [1120].

  17. GaN: From three- to two-dimensional single-layer crystal and its multilayer van der Waals solids

    NASA Astrophysics Data System (ADS)

    Onen, A.; Kecik, D.; Durgun, E.; Ciraci, S.

    2016-02-01

    Three-dimensional (3D) GaN is a III-V compound semiconductor with potential optoelectronic applications. In this paper, starting from 3D GaN in wurtzite and zinc-blende structures, we investigated the mechanical, electronic, and optical properties of the 2D single-layer honeycomb structure of GaN (g -GaN ) and its bilayer, trilayer, and multilayer van der Waals solids using density-functional theory. Based on high-temperature ab initio molecular-dynamics calculations, we first showed that g -GaN can remain stable at high temperature. Then we performed a comparative study to reveal how the physical properties vary with dimensionality. While 3D GaN is a direct-band-gap semiconductor, g -GaN in two dimensions has a relatively wider indirect band gap. Moreover, 2D g -GaN displays a higher Poisson ratio and slightly less charge transfer from cation to anion. In two dimensions, the optical-absorption spectra of 3D crystalline phases are modified dramatically, and their absorption onset energy is blueshifted. We also showed that the physical properties predicted for freestanding g -GaN are preserved when g -GaN is grown on metallic as well as semiconducting substrates. In particular, 3D layered blue phosphorus, being nearly lattice-matched to g -GaN , is found to be an excellent substrate for growing g -GaN . Bilayer, trilayer, and van der Waals crystals can be constructed by a special stacking sequence of g -GaN , and they can display electronic and optical properties that can be controlled by the number of g -GaN layers. In particular, their fundamental band gap decreases and changes from indirect to direct with an increasing number of g -GaN layers.

  18. The role of AlN encapsulation of GaN during implant activation annealing

    SciTech Connect

    Zolper, J.C.; Rieger, D.J.; Baca, A.G.; Pearton, S.J.; Lee, J.W.; Vartulli, C.R.; Stall, R.A.

    1996-09-01

    With the demonstration of implant doping of GaN and the resulting need to perform the activation anneal at 1100 C, details of thermal stability of the GaN surface needs to be understood. This work reports on the use of a sputtered AlN encapsulant to preserve the surface of GaN during such annealing. The surface was characterized by formation of Pt/Au Schottky contacts and by AES. Schottky contacts deposited an GaN annealed wtih the AlN encapsulant displayed good rectification properties while those formed on GaN annealed uncapped approached ohmic behavior. AES analysis supports the hypothesis that the uncapped sample has lost N from the very near surface which creates N-vacancies that act as donors and thereby form an n{sup +}-surface layer.

  19. GaN microdomes for broadband omnidirectional antireflection for concentrator photovoltaics

    NASA Astrophysics Data System (ADS)

    Han, Lu; McGoogan, Matthew R.; Piedimonte, Tyler A.; Kidd, Ian V.; French, Roger H.; Zhao, Hongping

    2013-03-01

    GaN microdomes are studied as a broadband omnidirectional anti-reflection structure for high efficiency multi-junction concentrated photovoltaics. Comprehensive studies of the effect of GaN microdome sizes and shapes on the light collection efficiency were studied. The three dimensional finite difference time domain (3-D FDTD) method was used to calculate the surface reflectance of GaN microdomes as compared to that of the flat surface. Studies indicate significant reduction of the surface reflectance is achievable by properly designing the microdome structures. Formation of the GaN microdomes with the flexibility to tune the size and shape has been demonstrated by using reactive ion etching (RIE) of both GaN and the self-assembled silica monolayer microspheres. Characterizations of the angle-dependence light surface reflectance for both micro-domes and flat surface show the similar trend as the simulation.

  20. Electronic structure and magnetic properties of substitutional transition-metal atoms in GaN nanotubes

    NASA Astrophysics Data System (ADS)

    Zhang, Min; Shi, Jun-Jie

    2014-01-01

    The electronic structure and magnetic properties of the transition-metal (TM) atoms (Sc—Zn, Pt and Au) doped zigzag GaN single-walled nanotubes (NTs) are investigated using first-principles spin-polarized density functional calculations. Our results show that the bindings of all TM atoms are stable with the binding energy in the range of 6-16 eV. The Sc- and V-doped GaN NTs exhibit a nonmagnetic behavior. The GaN NTs doped with Ti, Mn, Ni, Cu and Pt are antiferromagnetic. On the contrary, the Cr-, Fe-, Co-, Zn- and Au-doped GaN NTs show the ferromagnetic characteristics. The Mn- and Co-doped GaN NTs induce the largest local moment of 4μB among these TM atoms. The local magnetic moment is dominated by the contribution from the substitutional TM atom and the N atoms bonded with it.

  1. Time-resolved photoluminescence study of m-plane GaN thin films

    NASA Astrophysics Data System (ADS)

    Pan, Ji-Hong; Jang, Der-Jun; Quadir, Shaham; Lo, Ikai

    2014-03-01

    The optical properties and the carrier relaxation of GaN thin films were studied by time-resolved photoluminescence apparatus. The m-plane GaN thin films were grown on GaN buffer layer and γ-LiAlO2 substrates by molecular beam epitaxy with variation of N/Ga ratio. We found that the PL associated with defect is prominent for large N/Ga ratio due to the increasing of stacking faults. The intensity of PL perpendicular to the GaN [0001] direction is more intensive than that of PL parallel to the perpendicular to the GaN [0001] direction. The PL decay times exhibit dependence on the direction of the PL polarizations.

  2. Vertical nonpolar growth templates for light emitting diodes formed with GaN nanosheets

    NASA Astrophysics Data System (ADS)

    Yeh, Ting-Wei; Lin, Yen-Ting; Ahn, Byungmin; Stewart, Lawrence S.; Daniel Dapkus, P.; Nutt, Steven R.

    2012-01-01

    We demonstrate that nonpolar m-plane surfaces can be generated on uniform GaN nanosheet arrays grown vertically from the (0001)-GaN bulk material. InGaN/GaN multiple quantum wells (MQWs) grown on the facets of these nanosheets are demonstrated by cross-sectional transmission electron microscopy. Owing to the high aspect ratio of the GaN nanosheet structure, the MQWs predominantly grow on nonpolar GaN planes. The results suggest that GaN nanosheets provide a conduction path for device fabrication and also a growth template to reduce the piezoelectric field inside the active region of InGaN-based light emitting diodes.

  3. Prospects for the application of GaN power devices in hybrid electric vehicle drive systems

    NASA Astrophysics Data System (ADS)

    Su, Ming; Chen, Chingchi; Rajan, Siddharth

    2013-07-01

    GaN, a wide bandgap semiconductor successfully implemented in optical and high-speed electronic devices, has gained momentum in recent years for power electronics applications. Along with rapid progress in material and device processing technologies, high-voltage transistors over 600 V have been reported by a number of teams worldwide. These advances make GaN highly attractive for the growing market of electrified vehicles, which currently employ bipolar silicon devices in the 600-1200 V class for the traction inverter. However, to capture this billion-dollar power market, GaN has to compete with existing IGBT products and deliver higher performance at comparable or lower cost. This paper reviews key achievements made by the GaN semiconductor industry, requirements of the automotive electric drive system and remaining challenges for GaN power devices to fit in the inverter application of hybrid vehicles.

  4. Surface morphology evolution of m-plane (1100) GaN during molecular beam epitaxy growth: Impact of Ga/N ratio, miscut direction, and growth temperature

    SciTech Connect

    Shao Jiayi; Tang Liang; Malis, Oana; Edmunds, Colin; Gardner, Geoff; Manfra, Michael

    2013-07-14

    We present a systematic study of morphology evolution of [1100] m-plane GaN grown by plasma-assisted molecular beam epitaxy on free-standing m-plane substrates with small miscut angles towards the -c [0001] and +c [0001] directions under various gallium to nitrogen (Ga/N) ratios at substrate temperatures T = 720 Degree-Sign C and T = 740 Degree-Sign C. The miscut direction, Ga/N ratio, and growth temperature are all shown to have a dramatic impact on morphology. The observed dependence on miscut direction supports the notion of strong anisotropy in the gallium adatom diffusion barrier and growth kinetics. We demonstrate that precise control of Ga/N ratio and substrate temperature yields atomically smooth morphology on substrates oriented towards +c [0001] as well as the more commonly studied -c [0001] miscut substrates.

  5. Initial growth control of GaN on Si with physical-vapor-deposition-AlN seed layer for high-quality GaN templates

    NASA Astrophysics Data System (ADS)

    Wang, Hongbo; Sodabanlu, Hassanet; Daigo, Yoshiaki; Seino, Takuya; Nakagawa, Takashi; Sugiyama, Masakazu

    2016-05-01

    An ex situ AlN seed layer was formed by physical vapor deposition (PVD) on a Si substrate, aiming at the production of high-quality GaN on Si by metal–organic vapor-phase epitaxy. A low density of initial GaN islands were obtained by reducing the trimethylgallium (TMGa) flow rate. The dislocation density of GaN was dramatically reduced with 3D growth compared with 2D growth, as indicated by measurements of XRD rocking curves (FWHM of 384 and 461 arcsec for 0002 and 10\\bar{1}0 diffractions, respectively) and cathodoluminescence (CL) mapping (dark-spot density of 3.4 × 108 cm‑2) for 1-µm-thick crack-free GaN on a Si substrate. The values were almost equivalent to those of the layers grown on sapphire substrates.

  6. Defects in semipolar (1 1\\bar {2}\\bar {2}) ZnO grown on (112) LaAlO3/(La,Sr)(Al,Ta)O3 substrate by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Tian, -Sheng, Jr.; Wu, Yue-Han; Peng, Chun-Yen; Chiu, Kun-An; Shih, Yi-Sen; Do, Hien; Lin, Pei-Yin; Ho, Yen-Teng; Chu, Ying-Hao; Chang, Li

    2013-03-01

    The microstructure of semipolar (1 1\\bar {2}\\bar {2}) ZnO deposited on (112) LaAlO3/(La,Sr)(Al,Ta)O3 was investigated by transmission electron microscopy. The ZnO shows an in-plane epitaxial relationship of [1 1\\bar {2}3]_{{ZnO}}\\parallel [1 1\\bar {1}]_{{LAO/ LSAT}} with oxygen-face sense polarity. The misfit strain along [1 1\\bar {2}3]_{{ZnO}} and [1\\bar {1}0 0]_{{ZnO}} is relieved through the formation of misfit dislocations with the Burgers vectors \\mathbf{b}=1/6[1 1\\bar {2}3]_{{ZnO}} and \\mathbf{b}=1/3\\langle 1\\bar {2}1 0\\rangle _{{ZnO}}, respectively. The line defects in the semipolar ZnO are predominantly perfect dislocations, and the dislocation density decreases with increasing ZnO thickness as a result of dislocation reactions. Planar defects were observed to lie in the M-plane and extend along <0001>, whereas basal stacking faults were rarely found.

  7. Rokumi-jio-gan-Containing Prescriptions Attenuate Oxidative Stress, Inflammation, and Apoptosis in the Remnant Kidney

    PubMed Central

    Park, Chan Hum; Lee, Sul Lim; Okamoto, Takuya; Tanaka, Takashi; Yokozawa, Takako

    2012-01-01

    Two Rokumi-jio-gan-containing prescriptions (Hachimi-jio-gan and Bakumi-jio-gan) were selected to examine their actions in nephrectomized rats. Each prescription was given orally to rats for 10 weeks after the excision of five-sixths of their kidney volumes, and its effect was compared with non-nephrectomized and normal rats. Rats given Hachimi-jio-gan and Bakumi-jio-gan showed an improvement of renal functional parameters such as serum urea nitrogen, creatinine, creatinine clearance, and urinary protein. The nephrectomized rats exhibited the up-regulation of nicotinamide adenine dinucleotide phosphate oxidase subunits, c-Jun N-terminal kinase (JNK), phosphor-JNK, c-Jun, transforming growth factor-β1, nuclear factor-kappa B, cyclooxygenase-2, inducible nitric oxide synthase, monocyte chemotactic protein-1, intracellular adhesion molecule-1, Bax, cytochrome c, and caspase-3, and down-regulation of NF-E2-related factor 2, heme oxygenase-1, and survivin; however, Bakumi-jio-gan administration acts as a regulator in inflammatory reactions caused by oxidative stress in renal failure. Moreover, the JNK pathway and apoptosis-related protein expressions, Bax, caspase-3, and survivin, were ameliorated to the normal levels by Hachimi-jio-gan administration. The development of renal lesions, glomerular sclerosis, tubulointerstitial damage, and arteriolar sclerotic lesions, estimated by histopathological evaluation and scoring, was strong in the groups administered Hachimi-jio-gan rather than Bakumi-jio-gan. This study suggests that Rokumi-jio-gan-containing prescriptions play a protective role in the progression of renal failure. PMID:23243456

  8. Fabrication of low-density GaN/AlN quantum dots via GaN thermal decomposition in MOCVD

    PubMed Central

    2014-01-01

    With an appropriate high anneal temperature under H2 atmosphere, GaN quantum dots (QDs) have been fabricated via GaN thermal decomposition in metal organic chemical vapor deposition (MOCVD). Based on the characterization of atomic force microscopy (AFM), the obtained GaN QDs show good size distribution and have a low density of 2.4 × 108 cm-2. X-ray photoelectron spectroscopy (XPS) analysis demonstrates that the GaN QDs were formed without Ga droplets by thermal decomposition of GaN. PMID:25136276

  9. Fabrication of GaN Microporous Structure at a GaN/Sapphire Interface as the Template for Thick-Film GaN Separation Grown by HVPE

    NASA Astrophysics Data System (ADS)

    Chen, Jianli; Cheng, Hongjuan; Zhang, Song; Lan, Feifei; Qi, Chengjun; Xu, Yongkuan; Wang, Zaien; Li, Jing; Lai, Zhanping

    2016-06-01

    In this paper, a microporous structure at the GaN/sapphire interface has been obtained by an electrochemical etching method via a selective etching progress using an as-grown GaN/sapphire wafer grown by metal organic chemical vapor deposition. The as-prepared GaN interfacial microporous structure has been used as a template for the following growth of thick-film GaN crystal by hydride vapor phase epitaxy (HVPE), facilitating the fabrication of a free-standing GaN substrate detached from a sapphire substrate. The evolution of the interfacial microporous structure has been investigated by varying the etching voltages and time, and the formation mechanism of interfacial microporous structure has been discussed in detail as well. Appropriate interfacial microporous structure is beneficial for separating the thick GaN crystal grown by HVPE from sapphire during the cooling down process. The separation that occurred at the place of interfacial microporous can be attributed to the large thermal strain between GaN and sapphire. This work realized the fabrication of a free-standing GaN substrate with high crystal quality and nearly no residual strain.

  10. The growth and characterization of GaN films on cone-shaped patterned sapphire by MOCVD

    NASA Astrophysics Data System (ADS)

    Liang, Jing; Hongling, Xiao; Xiaoliang, Wang; Cuimei, Wang; Qingwen, Deng; Zhidong, Li; Jieqin, Ding; Zhanguo, Wang; Xun, Hou

    2013-11-01

    GaN films are grown on cone-shaped patterned sapphire substrates (CPSSs) by metal-organic chemical vapor deposition, and the influence of the temperature during the middle stage of GaN growth on the threading dislocation (TD) density of GaN is investigated. High-resolution X-ray diffraction (XRD) and cathode-luminescence (CL) were used to characterize the GaN films. The XRD results showed that the edge-type dislocation density of GaN grown on CPSS is remarkably reduced compared to that of GaN grown on conventional sapphire substrates (CSSs). Furthermore, when the growth temperature in the middle stage of GaN grown on CPSS decreases, the full width at half maximum of the asymmetry (102) plane of GaN is reduced. This reduction is attributed to the enhancement of vertical growth in the middle stage with a more triangular-like shape and the bending of TDs. The CL intensity spatial mapping results also showed the superior optical properties of GaN grown on CPSS to those of GaN on CSS, and that the density of dark spots of GaN grown on CPSS induced by nonradiative recombination is reduced when the growth temperature in the middle stage decreases.

  11. A rare case of a three way complex variant positive Philadelphia translocation involving chromosome (9;11;22)(q34;p15;q11) in chronic myeloid leukemia: A case report

    PubMed Central

    Asif, Muhammad; Hussain, Abrar; Rasool, Mahmood

    2016-01-01

    The t(9;22)(q34;q11) translocation is present in 90–95% of patients with chronic myeloid leukemia (CML). Variant complex translocations have been observed in 5–8% of CML patients, in which a third chromosome other than (9;22) is involved. Imatinib mesylate is the first line breakpoint cluster region-Abelson gene (BCR/ABL)-targeted oral therapy for CML, and may produce a complete response in 70–80% of CML patients in the chronic phase. In the present study, a bone marrow sample was used for conventional cytogenetic analysis, and the fluorescence in situ hybridization (FISH) test was used for BCR/ABL gene detection. A hematological analysis was also performed to determine the white blood cell (WBC) count, red blood cell count, hemoglobin levels, packed and mean cell volumes, mean corpuscular hemoglobin, mean corpuscular hemoglobin concentration and platelet values of the patient. The hematological analysis of the patient indicated the increased WBC of 186.5×103 cells/µl, and decreased hemoglobin levels of 11.1 g/dl. The FISH test revealed that 67% cells demonstrated BCR/ABL gene translocation. The patient was treated with 400 mg imatinib mesylate daily, and was monitored at various intervals over a 6-month period. The present study reports the rare case of a patient that demonstrates a three-way Philadelphia chromosome-positive translocation involving 46XY,t(9;11;22)(q34;p15;q11)[10], alongside CML in the chronic phase. The translocation was analyzed using cytogenetic and FISH tests. PMID:27602125

  12. Crack-free GaN substrates grown by the Na-flux method with a sapphire dissolution technique

    NASA Astrophysics Data System (ADS)

    Yamada, Takumi; Imanishi, Masayuki; Nakamura, Kosuke; Murakami, Kosuke; Imabayashi, Hiroki; Matsuo, Daisuke; Honjo, Masatomo; Maruyama, Mihoko; Imade, Mamoru; Yoshimura, Masashi; Mori, Yusuke

    2016-07-01

    GaN wafers are generally fabricated by separating a foreign substrate from a GaN layer using thermal stress; however, thermal stress also leads to the cracking of the GaN layer. In this study, we first succeeded in dissolving a sapphire substrate just after Na-flux growth by successively changing the flux content for GaN growth (Ga–Na–C) to that for dissolving sapphire (Ga–Na–C–Li) at the considered growth temperature. Hence, no thermal stress was induced in the grown GaN crystals, resulting in a crack-free GaN substrate. We concluded that this process is a good candidate technique for supplying free-standing GaN substrates.

  13. Wavelength limits for InGaN quantum wells on GaN

    SciTech Connect

    Pristovsek, Markus

    2013-06-17

    The emission wavelength of coherently strained InGaN quantum wells (QW) is limited by the maximum thickness before relaxation starts. For high indium contents x>40% the resulting wavelength decreases because quantum confinement dominates. For low indium content x<40% the electron hole wave function overlap (and hence radiative emission) is strongly reduced with increasing QW thickness due to the quantum confined Stark effect and imposes another limit. This results in a maximum usable emission wavelength at around 600 nm for QWs with 40%-50% indium content. Relaxed InGaN buffer layers could help to push this further, especially on non- and semi-polar orientations.

  14. Devices for medical diagnosis with GaN lasers

    NASA Astrophysics Data System (ADS)

    Kwasny, Miroslaw; Mierczyk, Zygmunt

    2003-10-01

    This paper presents laser-induced fluroescence method (LIF) employing endogenous ("autofluroescence") and exogenous fluorophores. LIF is applied for clinical diagnosis in dermatology, gynaecology, urology, lung tumors as well as for early dentin caries. We describe the analysers with He-Ne, He-Cd, and SHG Nd:YAG lasers and new generation systems based on blue semiconductor GaN lasers that have been implemented into clinical practice till now. The LIF method, fundamental one for many medical applications, with excitation radiation of wavelength 400 nm could be appl,ied only using tunable dye lasers or titanium lasers adequte for laboratory investigations. Development of GaN laser shows possibility to design portable, compact diagnostic devices as multi-channel analysers of fluorescence spectra and surface imaging devoted to clinical application. The designed systems used for spectra measurement and registration of fluorescence images include lasers of power 5-30 mW and generate wavelengths of 405-407 nm. They are widely used in PDT method for investigation of superficial distribution of accumulation kinetics of all known photosensitizers, their elimination, and degradation as well as for treatment of superficial lesions of mucosa and skin. Excitation of exogenous porphrins in Soret band makes possible to estimate their concentration and a period of healthy skin photosensitivity that occurs after photosensitiser injections. Due to high sensitivity of spectrum analysers, properties of photosensitisers can be investigated in vitro (e.g. their aggregation, purity, chromatographic distributions) when their concentrations are 2-3 times lower in comparison to concentrations investigated with typical spectrofluorescence methods. Dentistry diagnosis is a new field in which GaN laser devices can be applied. After induction with blue light, decreased autofluorescence intensity can be observed when dentin caries occur and strong characteristic bands of endogenous porphyrines

  15. Visible fiber lasers excited by GaN laser diodes

    NASA Astrophysics Data System (ADS)

    Fujimoto, Yasushi; Nakanishi, Jun; Yamada, Tsuyoshi; Ishii, Osamu; Yamazaki, Masaaki

    2013-07-01

    This paper describes and discusses visible fiber lasers that are excited by GaN laser diodes. One of the attractive points of visible light is that the human eye is sensitive to it between 400 and 700 nm, and therefore we can see applications in display technology. Of course, many other applications exist. First, we briefly review previously developed visible lasers in the gas, liquid, and solid-state phases and describe the history of primary solid-state visible laser research by focusing on rare-earth doped fluoride media, including glasses and crystals, to clarify the differences and the merits of primary solid-state visible lasers. We also demonstrate over 1 W operation of a Pr:WPFG fiber laser due to high-power GaN laser diodes and low-loss optical fibers (0.1 dB/m) made by waterproof fluoride glasses. This new optical fiber glass is based on an AlF3 system fluoride glass, and its waterproof property is much better than the well known fluoride glass of ZBLAN. The configuration of primary visible fiber lasers promises highly efficient, cost-effective, and simple laser systems and will realize visible lasers with photon beam quality and quantity, such as high-power CW or tunable laser systems, compact ultraviolet lasers, and low-cost ultra-short pulse laser systems. We believe that primary visible fiber lasers, especially those excited by GaN laser diodes, will be effective tools for creating the next generation of research and light sources.

  16. GaN Nanowire Devices: Fabrication and Characterization

    NASA Astrophysics Data System (ADS)

    Scott, Reum

    The development of microelectronics in the last 25 years has been characterized by an exponential increase of the bit density in integrated circuits (ICs) with time. Scaling solid-state devices improves cost, performance, and power; as such, it is of particular interest for companies, who gain a market advantage with the latest technology. As a result, the microelectronics industry has driven transistor feature size scaling from 10 μm to ~30 nm during the past 40 years. This trend has persisted for 40 years due to optimization, new processing techniques, device structures, and materials. But when noting processor speeds from the 1970's to 2009 and then again in 2010, the implication would be that the trend has ceased. To address the challenge of shrinking the integrated circuit (IC), current research is centered on identifying new materials and devices that can supplement and/or potentially supplant it. Bottom-up methods tailor nanoscale building blocks---atoms, molecules, quantum dots, and nanowires (NWs)---to be used to overcome these limitations. The Group IIIA nitrides (InN, AlN, and GaN) possess appealing properties such as a direct band gap spanning the whole solar spectrum, high saturation velocity, and high breakdown electric field. As a result nanostructures and nanodevices made from GaN and related nitrides are suitable candidates for efficient nanoscale UV/ visible light emitters, detectors, and gas sensors. To produce devices with such small structures new fabrication methods must be implemented. Devices composed of GaN nanowires were fabricated using photolithography and electron beam lithography. The IV characteristics of these devices were noted under different illuminations and the current tripled from 4.8*10-7 A to 1.59*10 -6 A under UV light which persisted for at least 5hrs.

  17. Ion implantation processing of GaN epitaxial layers

    SciTech Connect

    Tan, H.H.; Williams, J.S.; Zou, J.; Cockayne, D.J.H.; Pearton, S.J.; Yuan, C.

    1996-12-31

    Ion implantation induced-damage build up in epitaxial GaN layers grown on sapphire has been analyzed by ion channeling and electron microscopy techniques. The epitaxial layers are extremely resistant to ion beam damage in that substantial dynamic annealing of implantation disorder occurs even at liquid nitrogen temperatures. Amorphous layers can be formed in some cases if the implantation dose is high enough. However, the damage (amorphous or complex extended defects) that is formed is also extremely difficult to remove during annealing and required temperatures in excess of 1,100 C.

  18. Memristive GaN ultrathin suspended membrane array.

    PubMed

    Dragoman, Mircea; Tiginyanu, Ion; Dragoman, Daniela; Braniste, Tudor; Ciobanu, Vladimir

    2016-07-22

    We show that ultrathin GaN membranes, with a thickness of 15 nm and planar dimensions of 12 × 184 μm(2), act as memristive devices. The memristive behavior is due to the migration of the negatively-charged deep traps, which form in the volume of the membrane during the fabrication process, towards the unoccupied surface states of the suspended membranes. The time constant of the migration process is of the order of tens of seconds and varies with the current or voltage sweep. PMID:27291970

  19. H enhancement of N vacancy migration in GaN.

    SciTech Connect

    Wixom, Ryan R.; Wright, Alan Francis

    2005-06-01

    We have used density functional theory to investigate diffusion of V{sub N}{sup +} in the presence of H{sup +}. Optimal migration pathways were determined using the climbing image nudged elastic band and directed dimer methods. Our calculations indicate that the rate-limiting barrier for VN{sub N}{sup +} migration will be reduced by 0.58 eV by interplay with H{sup +}, which will enhance migration by more than an order of magnitude at typical GaN growth temperatures.

  20. Memristive GaN ultrathin suspended membrane array

    NASA Astrophysics Data System (ADS)

    Dragoman, Mircea; Tiginyanu, Ion; Dragoman, Daniela; Braniste, Tudor; Ciobanu, Vladimir

    2016-07-01

    We show that ultrathin GaN membranes, with a thickness of 15 nm and planar dimensions of 12 × 184 μm2, act as memristive devices. The memristive behavior is due to the migration of the negatively-charged deep traps, which form in the volume of the membrane during the fabrication process, towards the unoccupied surface states of the suspended membranes. The time constant of the migration process is of the order of tens of seconds and varies with the current or voltage sweep.

  1. High field effects of GaN HEMTs.

    SciTech Connect

    Barker, Joy; Shul, Randy John

    2004-09-01

    This report represents the completion of a Laboratory-Directed Research and Development (LDRD) program to develop and fabricate geometric test structures for the measurement of transport properties in bulk GaN and AlGaN/GaN heterostructures. A large part of this study was spent examining fabrication issues related to the test structures used in these measurements, due to the fact that GaN processing is still in its infancy. One such issue had to do with surface passivation. Test samples without a surface passivation, often failed at electric fields below 50 kV/cm, due to surface breakdown. A silicon nitride passivation layer of approximately 200 nm was used to reduce the effects of surface states and premature surface breakdown. Another issue was finding quality contacts for the material, especially in the case of the AlGaN/GaN heterostructure samples. Poor contact performance in the heterostructures plagued the test structures with lower than expected velocities due to carrier injection from the contacts themselves. Using a titanium-rich ohmic contact reduced the contact resistance and stopped the carrier injection. The final test structures had an etch constriction with varying lengths and widths (8x2, 10x3, 12x3, 12x4, 15x5, and 16x4 {micro}m) and massive contacts. A pulsed voltage input and a four-point measurement in a 50 {Omega} environment was used to determine the current through and the voltage dropped across the constriction. From these measurements, the drift velocity as a function of the applied electric field was calculated and thus, the velocity-field characteristics in n-type bulk GaN and AlGaN/GaN test structures were determined. These measurements show an apparent saturation velocity near to 2.5x10{sup 7} cm/s at 180 kV/cm and 3.1x10{sup 7} cm/s, at a field of 140 kV/cm, for the bulk GaN and AlGaN heterostructure samples, respectively. These experimental drift velocities mark the highest velocities measured in these materials to date and confirm

  2. Radiation enhanced basal plane dislocation glide in GaN

    NASA Astrophysics Data System (ADS)

    Yakimov, Eugene B.; Vergeles, Pavel S.; Polyakov, Alexander Y.; Lee, In-Hwan; Pearton, Stephen J.

    2016-05-01

    A movement of basal plane segments of dislocations in GaN films grown by epitaxial lateral overgrowth under low energy electron beam irradiation (LEEBI) was studied by the electron beam induced current (EBIC) method. Only a small fraction of the basal plane dislocation segments were susceptible to irradiation and the movement was limited to relatively short distances. The effect is explained by the radiation enhanced dislocation glide (REDG) in the structure with strong pinning. A dislocation velocity under LEEBI with a beam current lower than 1 nA was estimated as about 10 nm/s. The results assuming the REDG for prismatic plane dislocations were presented.

  3. Shape dependent electronic properties of wurzite GaN nanowire

    NASA Astrophysics Data System (ADS)

    Srivastava, Pankaj; Kumar, Avaneesh; Jaiswal, Neeraj K.; Sharma, Varun

    2016-05-01

    In the present work, energetic stability and electronic behavior of triangular and square shaped wurzite GaN NW oriented along [1100] and [11 2 0] direction has been investigated by employing ab-initio DFT calculation. Structural analysis suggests that triangular shaped NW undergoes strong surface reconstruction compared to square shaped NW. However, binding energy reveals that square shaped NW is energetically more feasible than triangular NW. Further, from electronic band structure we observe that both structures are metallic with higher metallicity for triangular shaped NW.

  4. Stress related aspects of GaN technology physics

    NASA Astrophysics Data System (ADS)

    Suhir, Ephraim

    2015-03-01

    Simple, easy-to-use and physically meaningful analytical models have been developed for the assessment of the combined effect of the lattice and thermal mismatch on the induced stresses in an elongated bi-material assembly, as well as on the thermal mismatch on the thermal stresses in a tri-material assembly, in which the lattice mismatched stresses are eliminated in one way or another. This could be done, e.g., by using a polished or an etched substrate. The analysis is carried out in application to Gallium Nitride (GaN)-Silicon Carbide (SiC) and GaN-diamond (C) filmsubstrate assemblies. The calculated data are obtained, assuming that no annealing or other stress reduction means is applied. The data agree reasonably well with the reported (available) in-situ measurements. The most important conclusion from the computed data is that even if a reasonably good lattice match takes place (as, e.g., in the case of a GaN film fabricated on a SiC substrate, when the mismatch strain is only about 3%) and, in addition, the temperature change (from the fabrication/growth temperature to the operation temperature) is significant (as high as 1000 °C), the thermal stresses are still considerably lower than the lattice-mismatch stresses. Although there are structural and technological means for further reduction of the lattice-mismatch stresses (e.g., by high temperature annealing or by providing one or more buffering layers, or by using patterned or porous substrates), there is still a strong incentive to eliminate completely the lattice mismatch stresses. This seems to be indeed possible, if polished or otherwise flattened (e.g., chemically etched) substrates and sputter deposited GaN film is employed. In such a case only thermal stresses remain, but even these could be reduced, if necessary, by using compliant buffering layers, including layers of variable compliance, or by introducing variable compliance into the properly engineered substrate. In any event, it is expected

  5. Study on photoemission surface of varied doping GaN photocathode

    NASA Astrophysics Data System (ADS)

    Qiao, Jianliang; Du, Ruijuan; Ding, Huan; Gao, Youtang; Chang, Benkang

    2014-09-01

    For varied doping GaN photocathode, from bulk to surface the doping concentrations are distributed from high to low. The varied doping GaN photocathode may produce directional inside electric field within the material, so the higher quantum efficiency can be obtained. The photoemission surface of varied doping GaN photocathode is very important to the high quantum efficiency, but the forming process of the surface state after Cs activation or Cs/O activation has been not known completely. Encircling the photoemission mechanism of varied GaN photocathode, considering the experiment phenomena during the activation and the successful activation results, the varied GaN photocathode surface model [GaN(Mg):Cs]:O-Cs after activation with cesium and oxygen was given. According to GaN photocathode activation process and the change of electronic affinity, the comparatively ideal NEA property can be achieved by Cs or Cs/O activation, and higher quantum efficiency can be obtained. The results show: The effective NEA characteristic of GaN can be gotten only by Cs. [GaN(Mg):Cs] dipoles form the first dipole layer, the positive end is toward the vacuum side. In the activation processing with Cs/O, the second dipole layer is formed by O-Cs dipoles, A O-Cs dipole includes one oxygen atom and two Cs atoms, and the positive end is also toward the vacuum side thus the escape of electrons can be promoted.

  6. Fabrication of GaN nanotubular material using MOCVD with aluminum oxide membrane

    NASA Astrophysics Data System (ADS)

    Jung, Woo-Gwang; Jung, Se-Hyuck; Kung, Patrick; Razeghi, Manijeh

    2006-02-01

    GaN nanotubular material is fabricated with aluminum oxide membrane in MOCVD. SEM, XRD, TEM and PL are employed to characterize the fabricated GaN nanotubular material. An aluminum oxide membrane with ordered nano holes is used as template. Gallium nitride is deposited at the inner wall of the nano holes in aluminum oxide template, and the nanotubular material with high aspect ratio is synthesized using the precursors of TMG and ammonia gas. Optimal synthesis condition in MOCVD is obtained successfully for the gallium nitride nanotubular material in this research. The diameter of GaN nanotube fabricated is approximately 200 ~ 250 nm and the wall thickness is about 40 ~ 50 nm. GaN nanotubular material consists of numerous fine GaN particulates with sizes ranging 15 to 30 nm. The composition of gallium nitride is confirmed to be stoichiometrically 1:1 for Ga and N by EDS. XRD and TEM analyses indicate that grains in GaN nanotubular material have nano-crystalline structure. No blue shift is found in the PL spectrum on the GaN nanotubular material fabricated in aluminum oxide template.

  7. Fabrication of GaN nanotubular material using MOCVD with an aluminium oxide membrane

    NASA Astrophysics Data System (ADS)

    Jung, Woo-Gwang; Jung, Se-Hyuck; Kung, Patrick; Razeghi, Manijeh

    2006-01-01

    GaN nanotubular material is fabricated with an aluminium oxide membrane in MOCVD. SEM, XRD, TEM and PL are employed to characterize the fabricated GaN nanotubular material. An aluminium oxide membrane with ordered nanoholes is used as a template. Gallium nitride is deposited at the inner wall of the nanoholes in the aluminium oxide template, and the nanotubular material with high aspect ratio is synthesized using the precursors of TMG and ammonia gas. Optimal synthesis conditions in MOCVD are obtained successfully for the gallium nitride nanotubular material in this research. The diameter of the GaN nanotube fabricated is approximately 200-250 nm and the wall thickness is about 40-50 nm. GaN nanotubular material consists of numerous fine GaN particulates with size range 15-30 nm. The composition of gallium nitride is confirmed to be stoichiometrically 1:1 for Ga and N by EDS. XRD and TEM analyses indicate that the grains in GaN nanotubular material have a nano-crystalline structure. No blue shift is found in the PL spectrum on the GaN nanotubular material fabricated in an aluminium oxide template.

  8. Kinetic-limited etching of magnesium doping nitrogen polar GaN in potassium hydroxide solution

    NASA Astrophysics Data System (ADS)

    Jiang, Junyan; Zhang, Yuantao; Chi, Chen; Yang, Fan; Li, Pengchong; Zhao, Degang; Zhang, Baolin; Du, Guotong

    2016-01-01

    KOH based wet etchings were performed on both undoped and Mg-doped N-polar GaN films grown by metal-organic chemical vapor deposition. It is found that the etching rate for Mg-doped N-polar GaN gets slow obviously compared with undoped N-polar GaN. X-ray photoelectron spectroscopy analysis proved that Mg oxide formed on N-polar GaN surface is insoluble in KOH solution so that kinetic-limited etching occurs as the etching process goes on. The etching process model of Mg-doped N-polar GaN in KOH solution is tentatively purposed using a simplified ideal atomic configuration. Raman spectroscopy analysis reveals that Mg doping can induce tensile strain in N-polar GaN films. Meanwhile, p-type N-polar GaN film with a hole concentration of 2.4 × 1017 cm-3 was obtained by optimizing bis-cyclopentadienyl magnesium flow rates.

  9. Influence of surface scattering on the thermal properties of spatially confined GaN nanofilm

    NASA Astrophysics Data System (ADS)

    Hou, Yang; Zhu, Lin-Li

    2016-08-01

    Gallium nitride (GaN), the notable representative of third generation semiconductors, has been widely applied to optoelectronic and microelectronic devices due to its excellent physical and chemical properties. In this paper, we investigate the surface scattering effect on the thermal properties of GaN nanofilms. The contribution of surface scattering to phonon transport is involved in solving a Boltzmann transport equation (BTE). The confined phonon properties of GaN nanofilms are calculated based on the elastic model. The theoretical results show that the surface scattering effect can modify the cross-plane phonon thermal conductivity of GaN nanostructures completely, resulting in the significant change of size effect on the conductivity in GaN nanofilm. Compared with the quantum confinement effect, the surface scattering leads to the order-of-magnitude reduction of the cross-plane thermal conductivity in GaN nanofilm. This work could be helpful for controlling the thermal properties of GaN nanostructures in nanoelectronic devices through surface engineering. Project supported by the National Natural Science Foundation of China (Grant Nos. 11302189 and 11321202) and the Doctoral Fund of Ministry of Education of China (Grant No. 20130101120175).

  10. Growth of GaN nanowall network on Si (111) substrate by molecular beam epitaxy

    PubMed Central

    2012-01-01

    GaN nanowall network was epitaxially grown on Si (111) substrate by molecular beam epitaxy. GaN nanowalls overlap and interlace with one another, together with large numbers of holes, forming a continuous porous GaN nanowall network. The width of the GaN nanowall can be controlled, ranging from 30 to 200 nm by adjusting the N/Ga ratio. Characterization results of a transmission electron microscope and X-ray diffraction show that the GaN nanowall is well oriented along the C axis. Strong band edge emission centered at 363 nm is observed in the spectrum of room temperature photoluminescence, indicating that the GaN nanowall network is of high quality. The sheet resistance of the Si-doped GaN nanowall network along the lateral direction was 58 Ω/. The conductive porous nanowall network can be useful for integrated gas sensors due to the large surface area-to-volume ratio and electrical conductivity along the lateral direction by combining with Si micromachining. PMID:23270331

  11. Synthesis of GaN nanocrystallites by pulsed laser ablation in pure nitrogen background gases

    NASA Astrophysics Data System (ADS)

    Yoshida, Takehito; Kakumoto, Soichiro; Sugimura, Akira; Umezu, Ikurou

    2011-09-01

    GaN is a promising material not only for electronic devices but also for photocatalysts. Synthesis of GaN nanocrystal is a key issue to improve performance for these applications. In the present study, GaN nanocrystallites have been synthesized by pulsed laser ablation (PLA), where safe and inactive pure N2 gases were used as reactive background gases. The third harmonics beam of a Q-switched Nd:YAG laser (355 nm, 10 mJ/pulse, 4 J/(cm2 pulse)) was used to ablate a sintered high purity GaN target. The deposition substrates were not heated. It was clarified that the formed GaN nanoparticles contained a hexagonal system with the wurtzite structure. The diameter of the nanocrystallites was about 10 nm, and showed only little dependence on the background gas pressure, while the porosity of the assembly of nanocrystallites and content of GaN nanocrystallites in the assembly increased with background gas pressure. Highly porous nanometer-sized GaN film obtained at higher gas pressure is considered to be candidate structures for the photocatalysts.

  12. Fabrication of photonic crystal circuits based on GaN ultrathin membranes by maskless lithography

    NASA Astrophysics Data System (ADS)

    Volciuc, Olesea; Braniste, Tudor; Sergentu, Vladimir; Ursaki, Veaceslav; Tiginyanu, Ion M.; Gutowski, Jürgen

    2015-06-01

    We report on maskless fabrication of photonic crystal (PhC) circuits based on ultrathin (d ~ 15 nm) nanoperforated GaN membranes exhibiting a triangular lattice arrangement of holes with diameters of 150 nm. In recent years, we have proposed and developed a cost-effective technology for GaN micro- and nanostructuring, the so-called surface charge lithography (SCL), which opened wide possibilities for a controlled fabrication of GaN ultrathin membranes. SCL is a maskless approach based on direct writing of negative charges on the surface of a semiconductor by a focused ion beam (FIB). These charges shield the material against photo-electrochemical (PEC) etching. Ultrathin GaN membranes suspended on specially designed GaN microstructures have been fabricated using a technological route based on SCL with two selected doses of ion beam treatment. Calculation of the dispersion law in nanoperforated membranes in the approximation of scalar waves is indicative of the occurrence of surface and bulk modes, and there is a range of frequencies where only surface modes can exist. Advantages of the occurrence of two types of modes in ultrathin nanoperforated GaN membranes from the point of view of their incorporation in photonic and optoelectronic integrated circuits are discussed. Along with this, we present the results of a comparative analysis of persistent photoconductivity (PPC) and optical quenching (OQ) effects occurring in continuous and nanoperforated ultrathin GaN suspended membranes, and assess the mechanisms behind these phenomena.

  13. Assessment of GaN chips for culturing cerebellar granule neurons.

    PubMed

    Young, Tai-Horng; Chen, Chi-Ruei

    2006-06-01

    In this work, the behaviors of cerebellar granule neurons prepared from 7-day-old Wistar rats on gallium nitride (GaN) were investigated. We believe that this is the first time that the GaN has been used as a substrate for neuron cultures to examine its effect on cell response in vitro. The GaN surface structure and its relationship with cells were examined by atomic force microscopy (AFM), metallography microscopy, scanning electron microscopy (SEM), lactate dehydrogenase (LDH) release and Western blot analysis. GaN is a so-called III-V compound semiconductor material with a wide bandgap and a relatively high bandgap voltage. Compared with silicon used for most neural chips, neurons seeded on GaN were able to form an extensive neuritic network and expressed very high levels of GAP-43 coincident with the neurite outgrowth. Therefore, the GaN structure may spatially mediate cellular response that can promote neuronal cell attachment, differentiation and neuritic growth. The favorable biocompatibility characteristics of GaN can be used to measure electric signals from networks of neuronal cells in culture to make it a possible candidate for use in a microelectrode array. PMID:16516287

  14. Surface chemistry and electronic structure of nonpolar and polar GaN films

    NASA Astrophysics Data System (ADS)

    Mishra, Monu; Krishna, T. C. Shibin; Aggarwal, Neha; Gupta, Govind

    2015-08-01

    Photoemission and microscopic analysis of nonpolar (a-GaN/r-Sapphire) and polar (c-GaN/c-Sapphire) epitaxial gallium nitride (GaN) films grown via RF-Molecular Beam Epitaxy is reported. The effect of polarization on surface properties like surface states, electronic structure, chemical bonding and morphology has been investigated and correlated. It was observed that polarization lead to shifts in core level (CL) as well as valence band (VB) spectra. Angle dependent X-ray Photoelectron Spectroscopic analysis revealed higher surface oxide in polar GaN film compared to nonpolar GaN film. On varying the take off angle (TOA) from 0° to 60°, the Gasbnd O/Gasbnd N ratio varied from 0.11-0.23 for nonpolar and 0.17-0.36 for polar GaN film. The nonpolar film exhibited N-face polarity while Ga-face polarity was perceived in polar GaN film due to the inherent polarization effect. Polarization charge compensated surface states were observed on the polar GaN film and resulted in downward band bending. Ultraviolet photoelectron spectroscopic measurements revealed electron affinity and ionization energy of 3.4 ± 0.1 eV and 6.8 ± 0.1 eV for nonpolar GaN film and 3.8 ± 0.1 eV and 7.2 ± 0.1 eV for polar GaN film respectively. Field Emission Scanning Electron Microscopy measurements divulged smooth morphology with pits on polar GaN film. The nonpolar film on the other hand showed pyramidal structures having facets all over the surface.

  15. Annealing effects on polycrystalline GaN using nitrogen and ammonia ambients

    NASA Astrophysics Data System (ADS)

    Ariff, A.; Zainal, N.; Hassan, Z.

    2016-09-01

    This paper describes effects of using post-annealing treatment in different conditions on the properties of polycrystalline GaN layer grown on m-plane sapphire substrate by electron beam (e-beam) evaporator. Without annealing, GaN surface was found to have a low RMS roughness with agglomeration of GaN grains in a specific direction and the sample consisted of gallium oxide (Ga2O3) material. When the post-annealing treatment was carried out in N2 ambient at 650 °C, initial re-crystallization of the GaN grains was observed while the evidence of Ga2O3 almost disappeared. As the NH3 annealing was conducted at 950 °C, more effect of re-crystallization occurred but with less grains coalescence. Three dominant XRD peaks of GaN in (10 1 bar 0) , (0002) and (10 1 bar 1) orientations were evident. Near band edge (NBE) related emission in GaN was also observed. The significant improvement was attributed to simultaneous recrystallization and effective reduction of N deficiency density. The post-annealing in a mixture of N2 and NH3 ambient at 950 °C was also conducted, but has limited the effectiveness of the N atoms to incorporate on the GaN layer due to 'clouding' effect by the inert N2 gas. Further increase in the annealing temperature at 980 °C and 1100 °C, respectively caused severe deteriorations of the structural and optical properties of the GaN layer. Overall, this work demonstrated initial potential in improving polycrystalline GaN material in simple and inexpensive manner.

  16. Highly c-axis oriented growth of GaN film on sapphire (0001) by laser molecular beam epitaxy using HVPE grown GaN bulk target

    SciTech Connect

    Kushvaha, S. S.; Kumar, M. Senthil; Maurya, K. K.; Dalai, M. K.; Sharma, Nita D.

    2013-09-15

    Growth temperature dependant surface morphology and crystalline properties of the epitaxial GaN layers grown on pre-nitridated sapphire (0001) substrates by laser molecular beam epitaxy (LMBE) were investigated in the range of 500–750 °C. The grown GaN films were characterized using high resolution x-ray diffraction, atomic force microscopy (AFM), micro-Raman spectroscopy, and secondary ion mass spectroscopy (SIMS). The x-ray rocking curve full width at a half maximum (FWHM) value for (0002) reflection dramatically decreased from 1582 arc sec to 153 arc sec when the growth temperature was increased from 500 °C to 600 °C and the value further decreased with increase of growth temperature up to 720 °C. A highly c-axis oriented GaN epitaxial film was obtained at 720 °C with a (0002) plane rocking curve FWHM value as low as 102 arc sec. From AFM studies, it is observed that the GaN grain size also increased with increasing growth temperature and flat, large lateral grains of size 200-300 nm was obtained for the film grown at 720 °C. The micro-Raman spectroscopy studies also exhibited the high-quality wurtzite nature of GaN film grown on sapphire at 720 °C. The SIMS measurements revealed a non-traceable amount of background oxygen impurity in the grown GaN films. The results show that the growth temperature strongly influences the surface morphology and crystalline quality of the epitaxial GaN films on sapphire grown by LMBE.

  17. Size dependence of melting of GaN nanowires with triangular cross sections

    SciTech Connect

    Wang, Zhiguo; Zu, Xiaotao; Gao, Fei; Weber, William J.

    2007-02-15

    Molecular dynamics simulations have been used to study the melting of GaN nanowires with triangular cross-sections. The curve of the potential energy, along with the atomic configuration is used to monitor the phase transition. The thermal stability of GaN nanowires is dependent on the size of the nanowires. The melting temperature of the GaN nanowires increases with the increasing of area cross-section of the nanowires to a saturation value. An interesting result is that of the nanowires start to melt from the edges, then the surface, and extends to the inner regions of nanowires as temperature increases.

  18. Stress and Defect Control in GaN Using Low Temperature Interlayers

    SciTech Connect

    Akasaki, I.; Amano, H.; Chason, E.; Figiel, J.; Floro, J.A.; Han, J.; Hearne, S.; Iwaya, M.; Kashima, T.; Katsuragcawa, M.

    1998-12-04

    In organometallic vapor phase epitaxial growth of Gail on sapphire, the role of the low- temperature-deposited interlayers inserted between high-temperature-grown GaN layers was investigated by in situ stress measurement, X-ray diffraction, and transmission electron microscopy. Insertion of a series of low temperature GaN interlayers reduces the density of threading dislocations while simultaneously increasing the tensile stress during growth, ultimately resulting in cracking of the GaN film. Low temperature AIN interlayers were found to be effective in suppressing cracking by reducing tensile stress. The intedayer approach permits tailoring of the film stress to optimize film structure and properties.

  19. Some effects of oxygen impurities on AlN and GaN

    NASA Astrophysics Data System (ADS)

    Slack, Glen A.; Schowalter, Leo J.; Morelli, Donald; Freitas, Jaime A.

    2002-12-01

    Oxygen is a common substitutional impurity in both AlN and GaN crystals. In the wurtzite 2H phase it can be present in AlN up to concentrations of 1×10 21/cm 3 while in GaN it can reach concentrations of 3×10 22/cm 3. These high concentrations of oxygen affect the luminescence, the optical absorption, the thermal conductivity, and the crystal perfection. The effects are somewhat similar in AlN and GaN. Representative experimental data will be presented to demonstrate the similarities, and to show how the oxygen content may be estimated from these property measurements.

  20. Density Functional Theory for Green Chemical Catalyst Supported on S-Terminated GaN(0001)

    NASA Astrophysics Data System (ADS)

    Yokoyama, Mami; Tsukamoto, Shiro; Ishii, Akira

    2011-12-01

    A novel function of nitried-based semiconductor is successfully developed for organic synthesis, in which palladium supported on the surface of S-terminated GaN(0001) serves as a unique green chemical catalyst. In this study we determined the structure of Pd-catalyst supported on S-terminated GaN(0001) surface by means of the density functional theory (DFT) within a Local Density Approximation (LDA). The important role of S on the case of GaN substrate is to make the number of the valence electron to be close to 0, it happened same way for GaAs substrate.

  1. Ion implantation doping and isolation of GaN

    SciTech Connect

    Pearton, S.J.; Vartuli, C.B.; Zolper, J.C.; Yuan, C.; Stall, R.A.

    1995-09-04

    {ital N}- and {ital p}-type regions have been produced in GaN using Si{sup +} and Mg{sup +}/P{sup +} implantation, respectively, and subsequent annealing at {similar_to}1100 {degree}C. Carrier activation percentages of 93% for Si and 62% for Mg were obtained for implant doses of 5{times}10{sup 14} cm{sup {minus}2} of each element. Conversely, highly resistive regions ({gt}5{times}10{sup 9} {Omega}/{D`Alembertian}) can be produced in initially {ital n}- or {ital p}- type GaN by N{sup +} implantation and subsequent annealing at {similar_to}750 {degree}C. The activation energy of the deep states controlling the resistivity of these implant-isolated materials is in the range 0.8--0.9 eV. These process modules are applicable to the fabrication of a variety of different GaN-based electronic and photonic devices. {copyright} {ital 1995} {ital American} {ital Institute} {ital of} {ital Physics}.

  2. Dielectrics for GaN based MIS-diodes

    SciTech Connect

    Ren, F.; Abernathy, C.R.; MacKenzie, J.D.

    1998-02-01

    GaN MIS diodes were demonstrated utilizing AlN and Ga{sub 2}O{sub 3}(Gd{sub 2}O{sub 3}) as insulators. A 345 {angstrom} of AlN was grown on the MOCVD grown n-GaN in a MOMBE system using trimethylamine alane as Al precursor and nitrogen generated from a wavemat ECR N2 plasma. For the Ga{sub 2}O{sub 3}(Gd{sub 2}O{sub 3}) growth, a multi MBE chamber was used and a 195 {angstrom} oxide is E-beam evaporated from a single crystal source of Ga{sub 5}Gd{sub 3}O{sub 12}. The forward breakdown voltage of AlN and Ga{sub 2}O{sub 3}(Gd{sub 2}O{sub 3}) diodes are 5V and 6V, respectively, which are significantly improved from {approximately} 1.2 V of schottky contact. From the C-V measurements, both kinds of diodes showed good charge modulation from accumulation to depletion at different frequencies. The insulator GaN interface roughness and the thickness of the insulator were measured with x-ray reflectivity.

  3. Orthodox etching of HVPE-grown GaN

    SciTech Connect

    Weyher, J.L.; Lazar, S.; Macht, L.; Liliental-Weber, Z.; Molnar,R.J.; Muller, S.; Nowak, G.; Grzegory, I.

    2006-08-10

    Orthodox etching of HVPE-grown GaN in molten eutectic of KOH + NaOH (E etch) and in hot sulfuric and phosphoric acids (HH etch) is discussed in detail. Three size grades of pits are formed by the preferential E etching at the outcrops of threading dislocations on the Ga-polar surface of GaN. Using transmission electron microscopy (TEM) as the calibration tool it is shown that the largest pits are formed on screw, intermediate on mixed and the smallest on edge dislocations. This sequence of size does not follow the sequence of the Burgers values (and thus the magnitude of the elastic energy) of corresponding dislocations. This discrepancy is explained taking into account the effect of decoration of dislocations, the degree of which is expected to be different depending on the lattice deformation around the dislocations, i.e. on the edge component of the Burgers vector. It is argued that the large scatter of optimal etching temperatures required for revealing all three types of dislocations in HVPE-grown samples from different sources also depends upon the energetic status of dislocations. The role of kinetics for reliability of etching in both etches is discussed and the way of optimization of the etching parameters is shown.

  4. X-ray detectors based on GaN

    NASA Astrophysics Data System (ADS)

    Duboz, J. Y.; Frayssinet, E.; Chenot, Sebastien; Reverchon, J. L.; Idir, M.

    2013-03-01

    The potential of GaN for X-ray detection in the range from 5 to 40 keV has been assessed. The absorption coefficient has been measured as a fonction of photon energy. Various detectors have been fabricated including MSM and Schottky diodes. They were tested under polychromatic X-ray illumination and under monochromatic irradiation from 6 to 22 keV in the Soleil synchrotron facility. The vertical Schottky diodes perform better as their geometry is better suited to the thick layers required by the low absorption coefficient. The operation mode is discussed in terms of photoconductive and photovoltaic behaviors. Some parasitic effects related to the electrical activation of defects by high energy photons and to the tunnel effect in lightly doped Schottky diodes have been evidenced. These effects disappear in diodes where the doping profile has been optimized. The spectral response is found to be very consistent with the spectral absorption coefficient. The sensitivity of GaN Schottky diodes is evaluated and found to be on the order of 40 photons per second. The response is fast nd linear.

  5. GaN and ZnO Light Emitters

    NASA Astrophysics Data System (ADS)

    Ha, J.-S.

    In the recent several decades, there are huge concerns in solid-state light emitters based on semiconductor compound materials, which emit light of ultraviolet to red light. Light-emitting diode (LED) fabrication technology for this application is now relatively mature. Currently, the lifetime of blue or green light-emitter are apparently determined mostly by light-induced degradation of a packaging unit encapsulating the LED. New renaissance is taking place in research societies and industries of LEDs because of the straight possibilities and needs for LED-based solid-state lighting in human life instead of the conventional ones employing incandescent, halogen, fluorescent lightings etc. Among various semiconductor compounds applicable to LEDs, GaN and ZnO are regarded as promising materials for solid-state lighting because ultraviolet- or blue-light emitters, which are applicable to white-light LEDs, based on these materials are possible. In this chapter, current technologies and researches on GaN- and ZnO-based LEDs are described. A special emphasis is given to the efficiency of the LEDs in the review of the GaN-based LEDs, while current status technologies in LED applications of ZnO-based materials have been reviewed.

  6. Si Donor Incorporation in GaN Nanowires.

    PubMed

    Fang, Zhihua; Robin, Eric; Rozas-Jiménez, Elena; Cros, Ana; Donatini, Fabrice; Mollard, Nicolas; Pernot, Julien; Daudin, Bruno

    2015-10-14

    With increasing interest in GaN based devices, the control and evaluation of doping are becoming more and more important. We have studied the structural and electrical properties of a series of Si-doped GaN nanowires (NWs) grown by molecular beam epitaxy (MBE) with a typical dimension of 2-3 μm in length and 20-200 nm in radius. In particular, high resolution energy dispersive X-ray spectroscopy (EDX) has illustrated a higher Si incorporation in NWs than that in two-dimensional (2D) layers and Si segregation at the edge of the NW with the highest doping. Moreover, direct transport measurements on single NWs have shown a controlled doping with resistivity from 10(2) to 10(-3) Ω·cm, and a carrier concentration from 10(17) to 10(20) cm(-3). Field effect transistor (FET) measurements combined with finite element simulation by NextNano(3) software have put in evidence the high mobility of carriers in the nonintentionally doped (NID) NWs. PMID:26426262

  7. Microstructural properties and dislocation evolution on a GaN grown on patterned sapphire substrate: A transmission electron microscopy study

    NASA Astrophysics Data System (ADS)

    Kim, Y. H.; Ruh, H.; Noh, Y. K.; Kim, M. D.; Oh, J. E.

    2010-03-01

    The microstructural properties of a GaN layer grown on a patterned sapphire substrate (PSS) were studied in detail using transmission electron microscope techniques to determine dislocation and growth behaviors. Regular and uniform recrystallized GaN islands were observed on the protruding pattern. On a flat sapphire surface, the crystallographic orientation relationship of ⟨1¯21¯0⟩GaN on FS//⟨11¯00⟩sapphire and {11¯01}GaN on FS//{12¯13}sapphire existed between the GaN and the substrate. On the other hand, the orientation relationship of ⟨1¯21¯0⟩GaN layer//⟨1¯21¯0⟩GaN island on IS//⟨11¯00⟩sapphire and {11¯01}GaN layer//{0002}GaN island on IS//{12¯13}sapphire was confirmed among the GaN layer, the recrystallized GaN islands on an inclined sapphire surface and the PSS. The flat surface among the protruding patterns began to fill rapidly with GaN. Then, the GaN gradually overgrew the protruding pattern and coalesced near the summit as the growth time increased. The generation of threading dislocations was observed in the vicinity of the coalescence points near the top of the protruding patterns.

  8. Controlled morphology of regular GaN microrod arrays by selective area growth with HVPE

    NASA Astrophysics Data System (ADS)

    Lekhal, Kaddour; Bae, Si-Young; Lee, Ho-Jun; Mitsunari, Tadashi; Tamura, Akira; Deki, Manato; Honda, Yoshio; Amano, Hiroshi

    2016-08-01

    The selective area growth (SAG) of GaN was implemented on patterned GaN/sapphire templates by hydride vapor phase epitaxy (HVPE) to fabricate regular arrays of Ga-polar GaN microrods. The control of growth parameters such as H2/N2 carrier gas ratio, growth temperature, and absolute NH3/HCl gas flow resulted in changes in the growth morphology. In particular, for an optimized mixed-carrier gas ratio of H2 to N2, we achieved vertically well-aligned microrods. The topmost regions of the GaN microrods were terminated with pyramidal facets, indicating typical Ga polarity. The optical properties of the grown microrods were characterized by cathodoluminescence (CL) at a low temperature. This revealed that the GaN microrods had high crystal quality since they exhibited suppressed yellow luminescence as well as strong band edge emission.

  9. Doping of Si into GaN nanowires and optical properties of resulting composites.

    PubMed

    Xu, Congkang; Chung, Sangyong; Kim, Misuk; Kim, Dong Eon; Chon, Bonghwan; Hong, Sangsu; Joo, Taiha

    2005-04-01

    Doping of Si into GaN nanowires has been successfully attained via thermal evaporation in the presence of a suitable gas atmosphere. Analysis indicated that the Si-doped GaN nanowire is a single crystal with a hexagonal wurtzite structure, containing 2.2 atom % of Si. The broadening and the shift of Raman peak to lower frequency are observed, which may be attributed to surface disorder and various strengths of the stress. The band-gap emission (358 nm) of Si-doped GaN nanowires relative to that (370 nm) of GaN nanowires has an apparent blue shift (approximately 12 nm), which can be ascribed to doping impurity Si. PMID:16004115

  10. High-resistance GaN epilayers with low dislocation density via growth mode modification

    NASA Astrophysics Data System (ADS)

    Xu, Z. Y.; Xu, F. J.; Wang, J. M.; Lu, L.; Yang, Z. J.; Wang, X. Q.; Shen, B.

    2016-09-01

    High-resistance GaN with low dislocation density adopting growth mode modification has been investigated by metalorganic chemical vapor deposition. The sheet resistance of the order of 1016 Ω/sq has been achieved at room temperature by diminishing the oxygen impurity level close to the substrate with an AlN blocking layer. Attributed to this method which offers more freedom to tailor the growth mode, a three-dimensional (3D) growth process is introduced by adjusting the growth pressure and temperature at the initial stage of the GaN epitaxy to improve the crystalline quality. The large 3D GaN grains formed during this period roughen the surface, and the following coalescence of the GaN grains causes threading dislocations bending, which finally remarkably reduces the dislocation density.

  11. A liftoff process of GaN layers and devices through nanoporous transformation

    NASA Astrophysics Data System (ADS)

    Zhang, Yu; Leung, Benjamin; Han, Jung

    2012-04-01

    A process to slice and separate GaN device layers for vertical light emitting diodes (LEDs) is presented through a developed electrochemical anodization process to create nanoporous (NP) GaN of designed porosity profiles. The NP GaN serves dual purposes of supporting subsequent overgrowth of LED structures while undergoing, during growth, shape transformation into a largely voided morphology. It is shown that this voided region decreases the lateral fracture resistance and enables large-area separation of the LED structures after appropriate wafer bonding. The separated LED layers are shown to have comparable material quality before and after the liftoff process. Blue emitting GaN LEDs are transferred to silicon substrates with vertical configuration by this unique process.

  12. Swelling or erosion on the surface of patterned GaN damaged by heavy ion implantation

    SciTech Connect

    Gao, Yuan; Lan, Chune; Xue, Jianming; Yan, Sha; Wang, Yugang; Xu, Fujun; Shen, Bo; Zhang, Yanwen

    2010-06-08

    Wurtzite undoped GaN epilayers (0 0 0 1) was implanted with 500 keV Au+ ions at room temperature under different doses, respectively. Ion implantation was performed through photoresist masks on GaN to produce alternating strips. The experimental results showed that the step height of swelling and decomposition in implanted GaN depended on ion dose and annealing temperature, i.e., damage level and its evolution. This damage evolution is contributed to implantation-induced defect production, and defect migration/accumulation occurred at different levels of displacement per atom. The results suggest that the swelling is due to the formation of porous structures in the amorphous region of implanted GaN. The decomposition of implanted area can be attributed to the disorder saturation and the diffusion of surface amorphous layer.

  13. GaN growth using gallium hydride generated by hydrogenation of liquid gallium

    NASA Astrophysics Data System (ADS)

    Nagayoshi, H.; Nishimura, S.; Takeuchi, T.; Hirai, M.; Terashima, K.

    2005-02-01

    The novel growth method of GaN using hydrogen radicals has been investigated. This paper is the first report of gallium hydrogenation reaction and deposition of GaN using hydrogenated gallium. We found that gallium (Ga) could be volatilized at low temperature by hydrogenation reaction with hydrogen radicals. In this reaction, Ga assumed to be volatilized as GaH 3. The GaN deposition was attempted by using gas phase reaction of NH 3 and GaH 3 generated by the reaction between liquid Ga and hydrogen radicals. Hydrogen radicals were generated by hot tungsten filament, which works as a catalyst during hydrogen cracking, whose temperature was 1600 °C. Surface morphology, deposition rate, and film structure were investigated. It was confirmed that GaN could be deposited by this method. The source materials of this method are safe and of low cost compared to the conventional methods.

  14. Leakage mechanism in GaN and AlGaN Schottky interfaces

    NASA Astrophysics Data System (ADS)

    Hashizume, Tamotsu; Kotani, Junji; Hasegawa, Hideki

    2004-06-01

    Based on detailed temperature-dependent current-voltage (I-V-T) measurements the mechanism of leakage currents through GaN and AlGaN Schottky interfaces is discussed. The experiments were compared to calculations based on thin surface barrier model in which the effects of surface defects were taken into account. Our simulation method reproduced the experimental I-V-T characteristics of the GaN and AlGaN Schottky diodes, and gave excellent fitting results to the reported Schottky I-V curves in GaN for both forward and reverse biases at different temperatures. The present results indicate that the barrier thinning caused by unintentional surface-defect donors enhances the tunneling transport processes, leading to large leakage currents through GaN and AlGaN Schottky interfaces.

  15. Droplet heteroepitaxy of zinc-blende vs. wurtzite GaN quantum dots

    NASA Astrophysics Data System (ADS)

    Reese, C.; Jeon, S.; Hill, T.; Jones, C.; Shusterman, S.; Yacoby, Y.; Clarke, R.; Deng, H.; Goldman, Rs

    We have developed a GaN droplet heteroepitaxy process based upon plasma-assisted molecular-beam epitaxy. Using various surface treatments and Ga deposition parameters, we have demonstrated polycrystalline, zinc-blende (ZB), and wurtzite (WZ) GaN quantum dots (QDs) on Si(001), r-Al2O3, Si(111), and c-GaN substrates. For the polar substrates (i.e. Si(111) and c-GaN), high-resolution transmission electron microscopy and coherent Bragg rod analysis reveals the formation of coherent WZ GaN QDs with nitridation-temperature-dependent sizes and densities. For the non-polar substrates (i.e. Si(001) and r-Al2O3) , QDs with strong near-band photoluminescence emission are observed and ZB GaN QD growth on Si(001) is demonstrated for the first time.

  16. Formation of helical dislocations in ammonothermal GaN substrate by heat treatment

    NASA Astrophysics Data System (ADS)

    Horibuchi, Kayo; Yamaguchi, Satoshi; Kimoto, Yasuji; Nishikawa, Koichi; Kachi, Tetsu

    2016-03-01

    GaN substrate produced by the basic ammonothermal method and an epitaxial layer on the substrate was evaluated using synchrotron radiation x-ray topography and transmission electron microscopy. We revealed that the threading dislocations present in the GaN substrate are deformed into helical dislocations and the generation of the voids by heat treatment in the substrate for the first observation in the GaN crystal. These phenomena are formed by the interactions between the dislocations and vacancies. The helical dislocation was formed in the substrate region, and not in the epitaxial layer region. Furthermore, the evaluation of the influence of the dislocations on the leakage current of Schottky barrier diodes fabricated on the epitaxial layer is discussed. The dislocations did not affect the leakage current characteristics of the epitaxial layer. Our results suggest that the deformation of dislocations in the GaN substrate does not adversely affect the epitaxial layer.

  17. High breakdown single-crystal GaN p-n diodes by molecular beam epitaxy

    SciTech Connect

    Qi, Meng; Zhao, Yuning; Yan, Xiaodong; Li, Guowang; Verma, Jai; Fay, Patrick; Nomoto, Kazuki; Zhu, Mingda; Hu, Zongyang; Protasenko, Vladimir; Song, Bo; Xing, Huili Grace; Jena, Debdeep; Bader, Samuel

    2015-12-07

    Molecular beam epitaxy grown GaN p-n vertical diodes are demonstrated on single-crystal GaN substrates. A low leakage current <3 nA/cm{sup 2} is obtained with reverse bias voltage up to −20 V. With a 400 nm thick n-drift region, an on-resistance of 0.23 mΩ cm{sup 2} is achieved, with a breakdown voltage corresponding to a peak electric field of ∼3.1 MV/cm in GaN. Single-crystal GaN substrates with very low dislocation densities enable the low leakage current and the high breakdown field in the diodes, showing significant potential for MBE growth to attain near-intrinsic performance when the density of dislocations is low.

  18. Depth dependence of defect density and stress in GaN grown on SiC

    NASA Astrophysics Data System (ADS)

    Faleev, N.; Temkin, H.; Ahmad, I.; Holtz, M.; Melnik, Yu.

    2005-12-01

    We report high resolution x-ray diffraction studies of the relaxation of elastic strain in GaN grown on SiC(0001). The GaN layers were grown with thickness ranging from 0.29to30μm. High level of residual elastic strain was found in thin (0.29to0.73μm thick) GaN layers. This correlates with low density of threading screw dislocations of 1-2×107cm-2, observed in a surface layer formed over a defective nucleation layer. Stress was found to be very close to what is expected from thermal expansion mismatch between the GaN and SiC. A model based on generation and diffusion of point defects accounts for these observations.

  19. Microstructure of GaN Grown on (111) Si by MOCVD

    SciTech Connect

    Fleming, J.G.; Follstaedt, D.M.; Han, J.; Provencio, P.

    1998-12-17

    Gallium nitride was grown on (111) Si by MOCVD by depositing an AIN buffer at 108O"C and then GaN at 1060 {degrees}C. The 2.2pm layer cracked along {1-100} planes upon cooling to room temperature, but remained adherent. We were able to examine the microstructure of material between cracks with TEM. The character and arrangement of dislocation are much like those of GaN grown on Al{sub 2}O{sub 3}: -2/3 pure edge and - 1/3 mixed (edge + screw), arranged in boundaries around domains of GaN that are slightly disoriented with respect to neighboring material. The 30 nm AIN buffer is continuous, indicating that AIN wets the Si, in contrast to GaN on Al{sub 2}O{sub 3}.

  20. Rare earth 4f hybridization with the GaN valence band

    NASA Astrophysics Data System (ADS)

    Wang, Lu; Mei, Wai-Ning; McHale, S. R.; McClory, J. W.; Petrosky, J. C.; Wu, J.; Palai, R.; Losovyj, Y. B.; Dowben, P. A.

    2012-11-01

    The placement of the Gd, Er and Yb 4f states within the GaN valence band has been explored by both experiment and theory. The 4d-4f photoemission resonances for various rare-earth(RE)-doped GaN thin films (RE = Gd, Er, Yb) provide an accurate depiction of the occupied 4f state placement within the GaN. The resonant photoemission show that the major Er and Gd RE 4f weight is at about 5-6 eV below the valence band maximum, similar to the 4f weights in the valence band of many other RE-doped semiconductors. For Yb, there is a very little resonant enhancement of the valence band of Yb-doped GaN, consistent with a large 4f14-δ occupancy. The placement of the RE 4f levels is in qualitative agreement with theoretical expectations.

  1. The rare earth 4 f hybridization with the GaN valence band

    NASA Astrophysics Data System (ADS)

    Wang, Lu; Mei, Wai-Ning; McHale, Steve; McClory, John; Petrosky, James; Wu, J.; Palai, Ratnakar; Losovyj, Yaroslav; Dowben, Peter

    2013-03-01

    The placement of the Gd, Er, and Yb 4f states within the GaN valence band has been explored by both experiment and theory. The 4 d - 4 f photoemission resonances for various rare earth doped GaN thin films (RE = Gd, Er, Yb) provide an accurate depiction of the occupied 4 f state placement within the GaN. The resonant photoemission show that the major Er and Gd rare earth 4 f weight is at about 5-6 eV below the valence band maximum, similar to the 4 f weights in the valence band of many other rare earth doped semiconductors. For Yb, there is very little resonant enhancement of the valence band of Yb doped GaN, consistent with a largely 4f 14 - δ occupancy. The placement of the rare earth 4 f levels is in qualitative agreement with theoretical expectations.

  2. Depth dependence of defect density and stress in GaN grown on SiC

    SciTech Connect

    Faleev, N.; Temkin, H.; Ahmad, I.; Holtz, M.; Melnik, Yu.

    2005-12-15

    We report high resolution x-ray diffraction studies of the relaxation of elastic strain in GaN grown on SiC(0001). The GaN layers were grown with thickness ranging from 0.29 to 30 {mu}m. High level of residual elastic strain was found in thin (0.29 to 0.73 {mu}m thick) GaN layers. This correlates with low density of threading screw dislocations of 1-2x10{sup 7} cm{sup -2}, observed in a surface layer formed over a defective nucleation layer. Stress was found to be very close to what is expected from thermal expansion mismatch between the GaN and SiC. A model based on generation and diffusion of point defects accounts for these observations.

  3. GaN grown on (1 1 1) single crystal diamond substrate by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Dussaigne, A.; Malinverni, M.; Martin, D.; Castiglia, A.; Grandjean, N.

    2009-10-01

    GaN epilayers are grown on (1 1 1) oriented single crystal diamond substrate by ammonia-source molecular beam epitaxy. Each step of the growth is monitored in situ by reflection high energy electron diffraction. It is found that a two-dimensional epitaxial wurtzite GaN film is obtained. The surface morphology is smooth: the rms roughness is as low as 1.3 nm for 2×2 μm 2 scan. Photoluminescence measurements reveal pretty good optical properties. The GaN band edge is centred at 3.469 eV with a linewidth of 5 meV. These results demonstrate that GaN heteroepitaxially grown on diamond opens new rooms for high power electronic applications.

  4. Surface potential barrier in m-plane GaN studied by contactless electroreflectance

    NASA Astrophysics Data System (ADS)

    Janicki, Lukasz; Misiewicz, Jan; Cywiński, Grzegorz; Sawicka, Marta; Skierbiszewski, Czeslaw; Kudrawiec, Robert

    2016-02-01

    Contactless electroreflectance (CER) is used to study the surface potential barrier in m-plane GaN UN+ [GaN (d = 20,30,50,70 nm)/GaN:Si] structures grown by using molecular beam epitaxy. Clear bandgap-related transitions followed by Franz-Keldysh oscillations (FKO) have been observed in the CER spectra of all samples at room temperature. The built-in electric fields in the undoped cap layers have been determined from the FKO period. From the built-in electric field and the undoped GaN layer thickness, the Fermi level location at the air-exposed m-plane GaN surface has been estimated as 0.42 ± 0.05 eV below the conduction band.

  5. Radiative defects in GaN nanocolumns: Correlation with growth conditions and sample morphology

    SciTech Connect

    Lefebvre, P.; Fernandez-Garrido, S.; Grandal, J.; Ristic, J.; Sanchez-Garcia, M.-A.; Calleja, E.

    2011-02-21

    Low-temperature photoluminescence is studied in detail in GaN nanocolumns (NCs) grown by plasma-assisted molecular beam epitaxy under various conditions (substrate temperature and impinging Ga/N flux ratio). The relative intensities of the different emission lines, in particular those related to structural defects, appear to be correlated with the growth conditions, and clearly linked to the NC sample morphology. We demonstrate, in particular, that all lines comprised between 3.10 and 3.42 eV rapidly lose intensity when the growth conditions are such that the NC coalescence is reduced. The well-known line around 3.45 eV, characteristic of GaN NC samples, shows, however, a behavior that is exactly the opposite of the other lines, namely, for growth conditions leading to reduced NC coalescence, this line tends to become more prominent, thus proving to be intrinsic to individual GaN NCs.

  6. Thermal Conductivity and Large Isotope Effect in GaN from First Principles

    SciTech Connect

    Lindsay, L.; Broido, D. A.; Reinecke, T. L.

    2012-08-28

    We present atomistic first principles results for the lattice thermal conductivity of GaN and compare them to those for GaP, GaAs, and GaSb. In GaN we find a large increase to the thermal conductivity with isotopic enrichment, ~65% at room temperature. We show that both the high thermal conductivity and its enhancement with isotopic enrichment in GaN arise from the weak coupling of heat-carrying acoustic phonons with optic phonons. This weak scattering results from stiff atomic bonds and the large Ga to N mass ratio, which give phonons high frequencies and also a pronounced energy gap between acoustic and optic phonons compared to other materials. Rigorous understanding of these features in GaN gives important insights into the interplay between intrinsic phonon-phonon scattering and isotopic scattering in a range of materials.

  7. In situ studies of the effect of silicon on GaN growth modes.

    SciTech Connect

    Munkholm, A.; Stephenson, G. B.; Eastman, J. A.; Auciello, O.; Murty, M. V. R.; Thompson, C.; Fini, P.; Speck, J. S.; DenBaars, S. P.; Northern Illinois Univ.; Univ. of California at Santa Barbara

    2000-12-01

    We present real-time X-ray scattering studies of the influence of silicon on the homoepitaxial growth mode of GaN grown by metal-organic vapor-phase epitaxy. Both annealing of Si-doped GaN and surface dosing of GaN with disilane are shown to change the mode of subsequent growth from step-flow to layer-by-layer. By comparing the growth behavior induced by doped layers which have been annealed to that induced by surface dosing, we extract an approximate diffusion coefficient for Si in GaN of 3.5 x 10{sup -18} cm{sup 2}/s at 810{sup o}C.

  8. Above room-temperature ferromagnetism of Mn delta-doped GaN nanorods

    SciTech Connect

    Lin, Y. T.; Wadekar, P. V.; Kao, H. S.; Chen, T. H.; Chen, Q. Y.; Tu, L. W.; Huang, H. C.; Ho, N. J.

    2014-02-10

    One-dimensional nitride based diluted magnetic semiconductors were grown by plasma-assisted molecular beam epitaxy. Delta-doping technique was adopted to dope GaN nanorods with Mn. The structural and magnetic properties were investigated. The GaMnN nanorods with a single crystalline structure and with Ga sites substituted by Mn atoms were verified by high-resolution x-ray diffraction and Raman scattering, respectively. Secondary phases were not observed by high-resolution x-ray diffraction and high-resolution transmission electron microscopy. In addition, the magnetic hysteresis curves show that the Mn delta-doped GaN nanorods are ferromagnetic above room temperature. The magnetization with magnetic field perpendicular to GaN c-axis saturates easier than the one with field parallel to GaN c-axis.

  9. The study of in situ scanning tunnelling microscope characterization on GaN thin film grown by plasma assisted molecular beam epitaxy

    SciTech Connect

    Yang, R.; Krzyzewski, T.; Jones, T.

    2013-03-18

    The epitaxial growth of GaN by Plasma Assisted Molecular Beam Epitaxy was investigated by Scanning Tunnelling Microscope (STM). The GaN film was grown on initial GaN (0001) and monitored by in situ Reflection High Energy Electron Diffraction and STM during the growth. The STM characterization was carried out on different sub-films with increased thickness. The growth of GaN was achieved in 3D mode, and the hexagonal edge of GaN layers and growth gradient were observed. The final GaN was of Ga polarity and kept as (0001) orientation, without excess Ga adlayers or droplets formed on the surface.

  10. P- and N-type implantation doping of GaN with Ca and O

    SciTech Connect

    Zolper, J.C.; Wilson, R.G.; Pearton, S.J.; Stall, R.A.

    1996-05-01

    III-N photonic devices have made great advances in recent years following the demonstration of doping of GaN p-type with Mg and n-type with Si. However, the deep ionization energy level of Mg in GaN ({approximately} 160 meV) limits the ionized of acceptors at room temperature to less than 1.0% of the substitutional Mg. With this in mind, the authors used ion implantation to characterize the ionization level of Ca in GaN since Ca had been suggested by Strite to be a shallow acceptor in GaN. Ca-implanted GaN converted from n-to-p type after a 1,100 C activation anneal. Variable temperature Hall measurements give an ionization level at 169 meV. Although this level is equivalent to that of Mg, Ca-implantation may have advantages (shallower projected range and less straggle for a given energy) than Mg for electronic devices. In particular, the authors report the first GaN device using ion implantation doping. This is a GaN junction field effect transistor (JFET) which employed Ca-implantation. A 1.7 {micro}m JFET had a transconductance of 7 mS/mm, a saturation current at 0 V gate bias of 33 mA/mm, a f{sub t} of 2.7 GHz, and a f{sub max} of 9.4 GHz. O-implantation was also studied and shown to create a shallow donor level ({approximately} 25 meV) that is similar to Si. SIMS profiles of as-implanted and annealed samples showed no measurable redistribution of either Ca or O in GaN at 1,125 C.

  11. High efficiency DC-DC converter using GaN transistors

    NASA Astrophysics Data System (ADS)

    Tómaş, Cosmin-Andrei; Grecu, Cristian; Pantazicǎ, Mihaela; Marghescu, Ion

    2015-02-01

    The paper presents a new high-efficiency power switching supply using the Gallium Nitride (GaN) technology. There are compared two solutions, the first using standard MOS transistors and the second using the new GaN transistor. The actual green technologies for obtaining the maximum energy and minimum losses have pushed the semiconductor industry into a continuous research regarding high power and high frequency devices, having uses in both digital communications and switching power supplies.

  12. Femtosecond dynamics of exciton bleaching in bulk GaN at room temperature

    NASA Astrophysics Data System (ADS)

    Huang, Yin-Chieh; Chern, Gia-Wei; Lin, Kung-Hsuan; Liang, Jian-Chin; Sun, Chi-Kuang; Hsu, Chia-Chen; Keller, Stacia; DenBaars, Steven P.

    2002-07-01

    Femtosecond transient transmission pump-probe technique was used to investigate exciton dynamics in a nominally undoped GaN thin film at room temperature. An exciton ionization time of 100-250 femtoseconds was observed by the time-resolved pump-probe measurement. A comparison experiment with pre-excited free carriers also confirmed the observation of the exciton ionization process in bulk GaN.

  13. GaN Stress Evolution During Metal-Organic Chemical Vapor Deposition

    SciTech Connect

    Amano, H.; Chason, E.; Figiel, J.; Floro, J.A.; Han, J.; Hearne, S.; Hunter, J.; Tsong, I.

    1998-10-14

    The evolution of stress in gallium nitride films on sapphire has been measured in real- time during metal organic chemical vapor deposition. In spite of the 161%0 compressive lattice mismatch of GaN to sapphire, we find that GaN consistently grows in tension at 1050"C. Furthermore, in-situ stress monitoring indicates that there is no measurable relaxation of the tensile growth stress during annealing or thermal cycling.

  14. The dispersion of BED ° in unintentional doped GaN crystals

    NASA Astrophysics Data System (ADS)

    Qingcheng, Bao; Fungleng, Zhang; Ke, Shi; Rensong, Dai; Xurong, Xu

    1986-09-01

    The polarization and the wavelength of the photoluminescence of BED ° in not intentionaly doped GaN crystal wafers are observed to be dependent on the excitation intensity (I-exc). When I-exc increases from 1 KW/CM 2 to 1000 KW/CM 2, they vary at first quadratically, and then, appear saturated. This phenomenon is resulted from dispersion effect of BED ° in GaN crystal wafers, which is proposed earlier (1).

  15. Evolution of deep centers in GaN grown by hydride vapor phaseepitaxy

    SciTech Connect

    Fang, Z.-Q.; Look, D.C.; Jasinski, J.; Benamara, M.; Liliental-Weber, Z.; Molnar, R.J.

    2001-04-18

    Deep centers and dislocation densities in undoped n GaN, grown by hydride vapor phase epitaxy (HVPE), were characterized as a function of the layer thickness by deep level transient spectroscopy and transmission electron microscopy, respectively. As the layer thickness decreases, the variety and concentration of deep centers increase, in conjunction with the increase of dislocation density. Based on comparison with electron irradiation induced centers, some dominant centers in HVPE GaN are identified as possible point defects.

  16. Mass transport, faceting and behavior of dislocations in GaN

    SciTech Connect

    Nitta, S.; Kashima, T.; Kariya, M.; Yukawa, Y.; Yamaguchi, S.; Amano, H.; Akasaki, I.

    2000-07-01

    The behavior of threading dislocations during mass transport of GaN was investigated in detail by transmission electron microscopy. Mass transport occurred at the surface. Therefore, growing species are supplied from the in-plane direction. The behavior of threading dislocations was found to be strongly affected by the mass transport process as well as the high crystallographic anisotropy of the surface energy of the facets particular to GaN.

  17. Atomistic Simulation of Brittle to Ductile Transition in GaN Nanotubes

    SciTech Connect

    Wang, Zhiguo; Zu, Xiaotao; Gao, Fei; Weber, William J.

    2006-12-11

    Molecular dynamics methods with a Stillinger-Weber potential have been used to investigate the mechanical properties of wurtzite-type single crystalline GaN nanotubes under applied tensile stresses. At lower temperatures, the nanotubes show brittle properties; whereas at higher temperatures, they behave as ductile materials. The brittle to ductile transition (BDT) is systemically investigated, and the corresponding transition temperatures have been determined in GaN. The BDT temperature generally increases with increasing thickness of nanotubes and strain rate.

  18. Strain dependent electron spin dynamics in bulk cubic GaN

    SciTech Connect

    Schaefer, A.; Buß, J. H.; Hägele, D.; Rudolph, J.; Schupp, T.; Zado, A.; As, D. J.

    2015-03-07

    The electron spin dynamics under variable uniaxial strain is investigated in bulk cubic GaN by time-resolved magneto-optical Kerr-rotation spectroscopy. Spin relaxation is found to be approximately independent of the applied strain, in complete agreement with estimates for Dyakonov-Perel spin relaxation. Our findings clearly exclude strain-induced relaxation as an effective mechanism for spin relaxation in cubic GaN.

  19. Influence of initial growth conditions and Mg-surfactant on the quality of GaN film grown by MOVPE

    NASA Astrophysics Data System (ADS)

    Junsong, Cao; Xin, Lü; Lubing, Zhao; Shuang, Qu; Wei, Gao

    2015-02-01

    The initial growth conditions of a 100 nm thick GaN layer and Mg-surfactant on the quality of the GaN epilayer grown on a 6H-SiC substrate by metal-organic vapor phase epitaxy have been investigated in this research. Experimental results have shown that a high V/III ratio and the initially low growth rate of the GaN layer are favorable for two-dimension growth and surface morphology of GaN and the formation of a smoother growth surface. Mg-surfactant occurring during GaN growth can reduce the dislocations density of the GaN epilayer but increase the surface RMS, which are attributed to the change of growth mode.

  20. An ultra-thin compliant sapphire membrane for the growth of less strained, less defective GaN

    NASA Astrophysics Data System (ADS)

    Moon, Daeyoung; Jang, Jeonghwan; Choi, Daehan; Shin, In-Su; Lee, Donghyun; Bae, Dukkyu; Park, Yongjo; Yoon, Euijoon

    2016-05-01

    An ultra-thin (26 nm) sapphire (Al2O3) membrane was used as a compliant substrate for the growth of high quality GaN. The density of misfit dislocations per unit length at the interface between the GaN layer and the sapphire membrane was reduced by 28% compared to GaN on the conventional sapphire substrate. Threading dislocation density in GaN on the sapphire membrane was measured to be 2.4×108/cm2, which is lower than that for GaN on the conventional sapphire substrate (3.2×108/cm2). XRD and micro-Raman results verifed that the residual stress in GaN on the sapphire membrane was as low as 0.02 GPa due to stress absorption by the ultra-thin compliant sapphire membrane.

  1. Probing deep level centers in GaN epilayers with variable-frequency capacitance-voltage characteristics of Au /GaN Schottky contacts

    NASA Astrophysics Data System (ADS)

    Wang, R. X.; Xu, S. J.; Shi, S. L.; Beling, C. D.; Fung, S.; Zhao, D. G.; Yang, H.; Tao, X. M.

    2006-10-01

    Under identical preparation conditions, Au /GaN Schottky contacts were prepared on two kinds of GaN epilayers with significantly different background electron concentrations and mobility as well as yellow emission intensities. Current-voltage (I-V) and variable-frequency capacitance-voltage (C-V) characteristics show that the Schottky contacts on the GaN epilayer with a higher background carrier concentration and strong yellow emission exhibit anomalous reverse-bias I-V and C-V characteristics. This is attributed to the presence of deep level centers. Theoretical simulation of the low-frequency C-V curves leads to a determination of the density and energy level position of the deep centers.

  2. Nanoheteroepitaxial lateral overgrowth of GaN on nanoporous Si(111)

    NASA Astrophysics Data System (ADS)

    Zang, K. Y.; Wang, Y. D.; Chua, S. J.; Wang, L. S.; Tripathy, S.; Thompson, C. V.

    2006-04-01

    Nanoheteroepitaxial (NHE) lateral overgrowth of GaN on nanoporous Si(111) substrates has been demonstrated. Nanopore arrays in Si(111) surfaces were fabricated using anodized aluminum oxide templates as etch masks, resulting in an average pore diameter and depth of about 60 and 160-180nm, respectively. NHE growth of AlN and GaN was found to result in a significant reduction in the threading dislocation density (<108cm-2) compared to that on flat Si(111). Most dislocations that originate at the Si interface bent to lie in the GaN (0001) basal plane during lateral growth over the pore openings. E2 phonon blueshifts in the Raman spectra indicate a significant relaxation of the tensile stress in the coalesced GaN films, due to three-dimensional stress relaxation mechanisms on porous substrates. Our results show that a single step lateral overgrowth of GaN on nanopatterned Si(111) substrates without a dielectric mask is a simple way to improve the crystalline quality of GaN layers for microelectronic applications.

  3. Behavior of aluminum adsorption and incorporation at GaN(0001) surface: First-principles study

    SciTech Connect

    Qin, Zhenzhen; Xiong, Zhihua Wan, Qixin; Qin, Guangzhao

    2013-11-21

    First-principles calculations are performed to study the energetics and atomic structures of aluminum adsorption and incorporation at clean and Ga-bilayer GaN(0001) surfaces. We find the favorable adsorption site changes from T4 to T1 as Al coverage increased to 1 monolayer on the clean GaN(0001) surface, and a two-dimensional hexagonal structure of Al overlayer appears. It is interesting the Al atoms both prefer to concentrate in one deeper Ga layer of clean and Ga-bilayer GaN(0001) surface, respectively, while different structures could be achieved in above surfaces. For the case of clean GaN(0001) surface, corresponding to N-rich and moderately Ga-rich conditions, a highly regular superlattice structure composed of wurtzite GaN and AlN becomes favorable. For the case of Ga-bilayer GaN(0001) surface, corresponding to extremely Ga-rich conditions, the Ga bilayer is found to be sustained stable in Al incorporating process, leading to an incommensurate structure directly. Furthermore, our calculations provide an explanation for the spontaneous formation of ordered structure and incommensurate structure observed in growing AlGaN films. The calculated results are attractive for further development of growth techniques and excellent AlGaN/GaN heterostructure electronic devices.

  4. GaN etching in BCl{sub 3}Cl{sub 2} plasmas

    SciTech Connect

    Shul, R.J.; Ashby, C.I.H.; Willison, C.G.; Zhang, L.; Han, J.; Bridges, M.M.; Pearton, S.J.; Lee, J.W.; Lester, L.F.

    1998-04-01

    GaN etching can be affected by a wide variety of parameters including plasma chemistry and plasma density. Chlorine-based plasmas have been the most widely used plasma chemistries to etch GaN due to the high volatility of the GaCl{sub 3} and NCl etch products. The source of Cl and the addition of secondary gases can dramatically influence the etch characteristics primarily due to their effect on the concentration of reactive Cl generated in the plasma. In addition, high-density plasma etch systems have yielded high quality etching of GaN due to plasma densities which are 2 to 4 orders of magnitude higher than reactive ion etch (RIE) plasma systems. The high plasma densities enhance the bond breaking efficiency of the GaN, the formation of volatile etch products, and the sputter desorption of the etch products from the surface. In this study, the authors report GaN etch results for a high-density inductively coupled plasma (ICP) as a function of BCl{sub 3}:Cl{sub 2} flow ratio, dc-bias, chamber-pressure, and ICP source power. GaN etch rates ranging from {approximately}100 {angstrom}/min to > 8,000 {angstrom}/min were obtained with smooth etch morphology and anisotropic profiles.

  5. Strain-induced step bunching in orientation-controlled GaN on Si

    NASA Astrophysics Data System (ADS)

    Narita, Tetsuo; Iguchi, Hiroko; Horibuchi, Kayo; Otake, Nobuyuki; Hoshi, Shinichi; Tomita, Kazuyoshi

    2016-05-01

    We report a technique for the fabrication of high-quality GaN-on-silicon (Si) substrates for use in various power applications. GaN epitaxial layers were generated on Si(111) vicinal faces that had been previously covered with a thin coating of Al2O3 to control the orientation of the AlN seed layers. We obtained orientation-controlled GaN layers and found a linear relationship between the GaN c-axis and Si[111] tilt angles. As a result, the threading dislocation density in the AlN seed layer was reduced and high-quality GaN layers were generated. The X-ray rocking curves for these layers exhibited full width at half maximum values of 390‧‧ and 550‧‧ for the (004) and (114) reflections, respectively. Significant step bunching was observed on a GaN(0001) vicinal face produced using this technique, attributed to strain-induced attractive interactions between steps. Thus, by controlling the strain near the surface layer, we achieved the step flow growth of GaN on Si.

  6. Layered transition metal dichalcogenides: promising near-lattice-matched substrates for GaN growth

    PubMed Central

    Gupta, Priti; Rahman, A. A.; Subramanian, Shruti; Gupta, Shalini; Thamizhavel, Arumugam; Orlova, Tatyana; Rouvimov, Sergei; Vishwanath, Suresh; Protasenko, Vladimir; Laskar, Masihhur R.; Xing, Huili Grace; Jena, Debdeep; Bhattacharya, Arnab

    2016-01-01

    Most III-nitride semiconductors are grown on non-lattice-matched substrates like sapphire or silicon due to the extreme difficulty of obtaining a native GaN substrate. We show that several layered transition-metal dichalcogenides are closely lattice-matched to GaN and report the growth of GaN on a range of such layered materials. We report detailed studies of the growth of GaN on mechanically-exfoliated flakes WS2 and MoS2 by metalorganic vapour phase epitaxy. Structural and optical characterization show that strain-free, single-crystal islands of GaN are obtained on the underlying chalcogenide flakes. We obtain strong near-band-edge emission from these layers, and analyse their temperature-dependent photoluminescence properties. We also report a proof-of-concept demonstration of large-area growth of GaN on CVD MoS2. Our results show that the transition-metal dichalcogenides can serve as novel near-lattice-matched substrates for nitride growth. PMID:27025461

  7. Enhancing the field emission properties of Se-doped GaN nanowires.

    PubMed

    Li, Enling; Wu, Guishuang; Cui, Zhen; Ma, Deming; Shi, Wei; Wang, Xiaolin

    2016-07-01

    Pure and Se-doped GaN nanowires (NWs) are synthesized on Pt-coated Si(111) substrates via chemical vapor deposition. The GaN NWs exhibit a uniform density with an average diameter of 20-120 nm. The structure of the NWs is wurtzite hexagonal, and the growth direction is along [0001]. Field emission measurements show that the Se-doped GaN NWs possess a low turn-on field (2.9 V μm(-1)) compared with the pure GaN NWs (7.0 V μm(-1)). In addition, density functional theory calculations indicate that the donor states near the Fermi level are mainly formed through the hybridization between Se 4p and N 2p orbitals and that the Fermi level move towards the vacuum level. Consequently, the work functions of Se-doped GaN NWs are lower than those of pure GaN NWs. PMID:27197556

  8. Influence of Annealing Conditions on Dopant Antirotation of Si+ and Mg+ Implanted GaN

    SciTech Connect

    Suvkhanov, A.; Parikh, N.; Usov, I.; Hunn, J.D.; Withrow, S.; Thomson, D.; Herke, T.; Davis, R.F.; Krasnobaev, L.

    1999-10-12

    This report reflects the results of heat treatment under various conditions on as-grown and ion implanted GaN. The PL spectrums of as-grown GaN and GaN with 400 A AlN cap were almost identical. This fact allows one to use PL analysis without AlN stripping. As-grown GaN and ion implanted with Mg and Si crystals were annealed at 1300 C for 10 minutes in three different conditions: in flowing argon gas; in flowing ultra high purity nitrogen; and in a quartz capsule sealed with nitrogen gas. The results of PL, RBS, SEM and TEM analysis show an advantage of GaN high temperature annealing in quartz capsules with nitrogen ambient as compared to annealing in argon and nitrogen gas flow. Encapsulation with nitrogen over-pressure prevents the decomposition of the GaN crystal and the AlN capping film, and allows one to achieve optical activation of implanted Mg and Si after 1300 C annealing.

  9. Hybrid device based on GaN nanoneedles and MEH-PPV/PEDOT:PSS polymer

    SciTech Connect

    Shin, Min Jeong; Gwon, Dong-Oh; Lee, Chan-Mi; Lee, Gang Seok; Jeon, In-Jun; Ahn, Hyung Soo; Yi, Sam Nyung; Ha, Dong Han

    2015-08-15

    Highlights: • A hybrid device was demonstrated by using MEH-PPV, PEDOT:PSS, and GaN nanoneedles. • I–V curve of the hybrid device showed its rectification behaviour, similar to a diode. • EL peak originated by the different potential barriers at MEH-PPV and GaN interface. - Abstract: A hybrid device that combines the properties of organic and inorganic semiconductors was fabricated and studied. It incorporated poly[2-methoxy-5-(2-ethylhexyloxy)- 1,4-phenylenevinylene] (MEH-PPV) and poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) as organic polymers and GaN nanoneedles as an inorganic semiconductor. Layers of the two polymers were spin coated on to the GaN nanoneedles. The one peak in the electroluminescence spectrum originated from the MEH-PPV layer owing to the different potential barriers of electrons and holes at its interface with the GaN nanoneedles. However, the photoluminescence spectrum showed peaks due to both GaN nanoneedles and MEH-PPV. Such hybrid structures, suitably developed, might be able to improve the efficiency of optoelectronic devices.

  10. A comparative DFT study of the structural and electronic properties of nonpolar GaN surfaces

    NASA Astrophysics Data System (ADS)

    González-Hernández, Rafael; González-García, Alvaro; Barragán-Yani, Daniel; López-Pérez, William

    2014-09-01

    A comparative analysis of the geometry and the electronic characteristics of nonpolar GaN surfaces was carried out using density-functional theory (DFT) with different approximations for the exchange-correlation energy (LDA, PBE, PBEsol, RPBE, TPSS, revTPSS, and HSE). The obtained data show that the GaN(1 0 1bar 0) (m-plane) is more energetically stable than the GaN(1 1 2bar 0) (a-plane) surface. However, these surfaces have similar surface relaxation geometry, with a Ga-N surface bond-length contraction of around 6-7% and a Ga-N surface rotational angle in the range of 6-9°. Our results show that the use of different exchange-correlation functionals does not significantly change the surface energy and surface geometry. In addition, we found the presence of surface intra-gap states that reduce the band gap of the nonpolar GaN surface with respect to the bulk value, in agreement with recent photoelectron and surface optical spectroscopy experiments.

  11. Layered transition metal dichalcogenides: promising near-lattice-matched substrates for GaN growth

    NASA Astrophysics Data System (ADS)

    Gupta, Priti; Rahman, A. A.; Subramanian, Shruti; Gupta, Shalini; Thamizhavel, Arumugam; Orlova, Tatyana; Rouvimov, Sergei; Vishwanath, Suresh; Protasenko, Vladimir; Laskar, Masihhur R.; Xing, Huili Grace; Jena, Debdeep; Bhattacharya, Arnab

    2016-03-01

    Most III-nitride semiconductors are grown on non-lattice-matched substrates like sapphire or silicon due to the extreme difficulty of obtaining a native GaN substrate. We show that several layered transition-metal dichalcogenides are closely lattice-matched to GaN and report the growth of GaN on a range of such layered materials. We report detailed studies of the growth of GaN on mechanically-exfoliated flakes WS2 and MoS2 by metalorganic vapour phase epitaxy. Structural and optical characterization show that strain-free, single-crystal islands of GaN are obtained on the underlying chalcogenide flakes. We obtain strong near-band-edge emission from these layers, and analyse their temperature-dependent photoluminescence properties. We also report a proof-of-concept demonstration of large-area growth of GaN on CVD MoS2. Our results show that the transition-metal dichalcogenides can serve as novel near-lattice-matched substrates for nitride growth.

  12. The hydride vapor phase epitaxy of GaN on silicon covered by nanostructures

    NASA Astrophysics Data System (ADS)

    Jahn, U.; Musolino, M.; Lähnemann, J.; Dogan, P.; Fernández Garrido, S.; Wang, J. F.; Xu, K.; Cai, D.; Bian, L. F.; Gong, X. J.; Yang, H.

    2016-06-01

    GaN several tens of μm thick has been deposited on a silicon substrate using a two-step hydride vapor phase epitaxy (HVPE) process. The substrates were covered by AlN layers and GaN nanostructures grown by plasma-assisted molecular-beam epitaxy. During the first low-temperature (low-T) HVPE step, stacking faults (SF) form, which show distinct luminescence lines and stripe-like features in the cathodoluminescence images of the cross-section of the layers. These cathodoluminescence features provide an insight into the growth process. During a second high-temperature (high-T) step, the SFs disappear, and the luminescence of this part of the GaN layer is dominated by the donor-bound exciton. For templates consisting of both a thin AlN buffer and GaN nanostructures, the incorporation of silicon into the GaN grown by HVPE is not observed. Moreover, the growth mode of the (high-T) HVPE step depends on the specific structure of the AlN/GaN template, where in the first case, epitaxy is dominated by the formation of slowly growing facets, while in the second case, epitaxy proceeds directly along the c-axis. For templates without GaN nanostructures, cathodoluminescence spectra excited close to the Si/GaN interface show a broadening toward higher energies, indicating the incorporation of silicon at a high dopant level.

  13. Reduction of stress at the initial stages of GaN growth on Si(111)

    NASA Astrophysics Data System (ADS)

    Dadgar, A.; Poschenrieder, M.; Reiher, A.; Bläsing, J.; Christen, J.; Krtschil, A.; Finger, T.; Hempel, T.; Diez, A.; Krost, A.

    2003-01-01

    GaN growth on heterosubstrates usually leads to an initially high dislocation density at the substrate/seed layer interface. Due to the initial growth from small crystallites, tensile stress is generated at the coalescence boundaries during GaN growth. In addition, with tensile thermal stress this leads to cracking of GaN on Si and SiC substrates when cooling to room temperature. By partially masking the typically applied AlN seed layer on Si(111) with an in situ deposited SiN mask a reduction in tensile stress can be achieved for the subsequently grown GaN layer. Additionally, the 6 K GaN band edge photoluminescence is increased by about an order of magnitude and shifts by 21 meV, which can be attributed to a change in tensile stress of ˜0.8 GPa, in good agreement with x-ray diffractometry measurements. This improvement in material properties can be attributed to a reduction of grain boundaries by the growth of larger sized crystallites and lateral overgrowth of less defective GaN.

  14. GaN Metal Oxide Semiconductor Field Effect Transistors

    SciTech Connect

    Ren, F.; Pearton, S.J.; Abernathy, C.R.; Baca, A.; Cheng, P.; Shul, R.J.; Chu, S.N.G.; Hong, M.; Lothian, J.R.; Schurman, M.J.

    1999-03-02

    A GaN based depletion mode metal oxide semiconductor field effect transistor (MOSFET) was demonstrated using Ga{sub 2}O{sub 3}(Gd{sub 2}O{sub 3}) as the gate dielectric. The MOS gate reverse breakdown voltage was > 35V which was significantly improved from 17V of Pt Schottky gate on the same material. A maximum extrinsic transconductance of 15 mS/mm was obtained at V{sub ds} = 30 V and device performance was limited by the contact resistance. A unity current gain cut-off frequency, f{sub {tau}}, and maximum frequency of oscillation, f{sub max} of 3.1 and 10.3 GHz, respectively, were measured at V{sub ds} = 25 V and V{sub gs} = {minus}20 V.

  15. Stacking fault related luminescence in GaN nanorods.

    PubMed

    Forsberg, M; Serban, A; Poenaru, I; Hsiao, C-L; Junaid, M; Birch, J; Pozina, G

    2015-09-01

    Optical and structural properties are presented for GaN nanorods (NRs) grown in the [0001] direction on Si(111) substrates by direct-current reactive magnetron sputter epitaxy. Transmission electron microscopy (TEM) reveals clusters of dense stacking faults (SFs) regularly distributed along the c-axis. A strong emission line at ∼3.42 eV associated with the basal-plane SFs has been observed in luminescence spectra. The optical signature of SFs is stable up to room temperatures with the activation energy of ∼20 meV. Temperature-dependent time-resolved photoluminescence properties suggest that the recombination mechanism of the 3.42 eV emission can be understood in terms of multiple quantum wells self-organized along the growth axis of NRs. PMID:26267041

  16. Inversion domains in GaN grown on sapphire

    SciTech Connect

    Romano, L.T.; Northrup, J.E.; OKeefe, M.A.

    1996-10-01

    Planar defects observed in GaN films grown on (0001) sapphire have been identified as inversion domain boundaries (IDBs) by a combination of high resolution transmission electron microscopy, multiple dark field imaging, and convergent beam electron diffraction techniques. Films grown by molecular beam epitaxy (MBE), metalorganic vapor deposition (MOCVD), and hydride vapor phase epitaxy (HVPE) were investigated and all were found to contain IDBs. The IDBs in the MBE and HVPE films extended from the interface to the film surface and formed columnar domains that ranged in width from 3 to 20 nm in the MBE films and up to 100 nm in the HVPE films. For the films investigated, the MBE films had the highest density, and the MOCVD films had the lowest density of IDBs. The nucleation of inversion domains (IDs) may result from step-related inhomogeneities of the GaN/sapphire interface. {copyright} {ital 1996 American Institute of Physics.}

  17. GaN directional couplers for integrated quantum photonics

    SciTech Connect

    Zhang Yanfeng; McKnight, Loyd; Watson, Ian M.; Gu, Erdan; Calvez, Stephane; Dawson, Martin D.; Engin, Erman; Cryan, Martin J.; Thompson, Mark G.; O'Brien, Jeremy L.

    2011-10-17

    Large cross-section GaN waveguides are proposed as a suitable architecture to achieve integrated quantum photonic circuits. Directional couplers with this geometry have been designed with aid of the beam propagation method and fabricated using inductively coupled plasma etching. Scanning electron microscopy inspection shows high quality facets for end coupling and a well defined gap between rib pairs in the coupling region. Optical characterization at 800 nm shows single-mode operation and coupling-length-dependent splitting ratios. Two photon interference of degenerate photon pairs has been observed in the directional coupler by measurement of the Hong-Ou-Mandel dip [C. K. Hong, et al., Phys. Rev. Lett. 59, 2044 (1987)] with 96% visibility.

  18. Spontaneous emission enhancement in micropatterned GaN

    NASA Astrophysics Data System (ADS)

    Niehus, M.; Sanguino, P.; Monteiro, T.; Soares, M. J.; Schwarz, R.

    2004-10-01

    With two interfering pulses from the fourth harmonic of a Nd-YAG laser we burnt a periodic lattice structure into the surface of GaN thin films. The lattice period of this permanent grating could be controlled between less than one and several tens of microns. Above the decomposition threshold, nitrogen evades from the sample surface, and the residual metallic gallium accumulates in the form of tiny droplets at the surfaces. The patterned structure shows structural similarities with microcavities. The question arises if the residual metallic gallium may act as a partially reflecting mirror. To test this hypothesis, we studied the steady-state and transient photoluminescence through the modulation of light emerging from the ubiquitous broad "yellow" photoluminescence band. The microlattice is evidenced by energy-equidistant spontaneous emission enhancement peaks in the steady-state photoluminescence spectra. We suggest that the partial reflection due to the residual metallic gallium leads to the observed enhancement effect.

  19. Influence of dopants on defect formation in GaN

    SciTech Connect

    Liliental-Weber, Z.; Jasinski, J.; Benamara, M.; Grzegory, I.; Porowski, S.; Lampert, D.J.H.; Eiting, C.J.; Dupuis R.D.

    2001-10-15

    Influence of p-dopants (Mg and Be) on the structure of GaN has been studied using Transmission Electron Microscopy (TEM). Bulk GaN:Mg and GaN:Be crystals grown by a high pressure and high temperature process and GaN:Mg grown by metal-organic chemical-vapor deposition (MOCVD) have been studied. Structural dependence on growth polarity was observed in the bulk crystals. Spontaneous ordering in bulk GaN:Mg on c-plane (formation of Mg-rich planar defects with characteristics of inversion domains) was observed for growth in the N to Ga polar direction (N polarity). On the opposite site of the crystal (growth in the Ga to N polar direction) Mg-rich pyramidal defects empty inside (pinholes) were observed. Both these defects were also observed in MOCVD grown crystals. Pyramidal defects were also observed in the bulk GaN:Be crystals.

  20. Intrinsic polarization control in rectangular GaN nanowire lasers

    DOE PAGESBeta

    Li, Changyi; Liu, Sheng; Luk, Ting S.; Figiel, Jeffrey J.; Brener, Igal; Brueck, S. R. J.; Wang, George T.

    2016-02-01

    In this study, we demonstrate intrinsic, linearly polarized lasing from single GaN nanowires using cross-sectional shape control. A two-step top-down fabrication approach was employed to create straight nanowires with controllable rectangular cross-sections. A clear lasing threshold of 444kW/cm2 and a narrow spectral line width of 0.16 nm were observed under optical pumping at room temperature, indicating the onset of lasing. The polarization was along the short dimension (y-direction) of the nanowire due to the higher transverse confinement factors for y-polarized transverse modes resulting from the rectangular nanowire cross-section. The results show that cross-sectioned shape control can enable inherent control overmore » the polarization of nanowire lasers without additional environment requirements, such as placement onto lossy substrates.« less

  1. Intrinsic polarization control in rectangular GaN nanowire lasers.

    PubMed

    Li, Changyi; Liu, Sheng; Luk, Ting S; Figiel, Jeffrey J; Brener, Igal; Brueck, S R J; Wang, George T

    2016-03-01

    We demonstrate intrinsic, linearly polarized lasing from single GaN nanowires using cross-sectional shape control. A two-step top-down fabrication approach was employed to create straight nanowires with controllable rectangular cross-sections. A clear lasing threshold of 444 kW cm(-2) and a narrow spectral line width of 0.16 nm were observed under optical pumping at room temperature, indicating the onset of lasing. The polarization was along the short dimension (y-direction) of the nanowire due to the higher transverse confinement factors for y-polarized transverse modes resulting from the rectangular nanowire cross-section. The results show that cross-sectioned shape control can enable inherent control over the polarization of nanowire lasers without additional environment requirements, such as placement onto lossy substrates. PMID:26899502

  2. Enhanced water splitting with silver decorated GaN photoelectrode

    NASA Astrophysics Data System (ADS)

    Hou, Y.; Syed, Z. A.; Smith, R.; Athanasiou, M.; Gong, Y.; Yu, X.; Bai, J.; Wang, T.

    2016-07-01

    By means of a cost-effective approach, we demonstrate a GaN-based photoelectrode decorated with self-organized silver nano-islands employed for solar powered hydrogen generation, demonstrating 4 times increase in photocurrent compared with a reference sample without using any silver. Our photoelectrode exhibits a 60% incident photon-to-electron conversion efficiency. The enhanced hydrogen generation is attributed to a significantly increased carrier generation rate as a result of strongly localized electric fields induced by surface plasmon coupling effect. The silver coating also contributes to the good chemical stability of our photoelectrode in a strong alkali electrolyte. This work paves the way for the development of GaN and also InGaN based photoelectrodes with ultra-high solar hydrogen conversion efficiency.

  3. Intrinsic polarization control in rectangular GaN nanowire lasers

    NASA Astrophysics Data System (ADS)

    Li, Changyi; Liu, Sheng; Luk, Ting. S.; Figiel, Jeffrey J.; Brener, Igal; Brueck, S. R. J.; Wang, George T.

    2016-03-01

    We demonstrate intrinsic, linearly polarized lasing from single GaN nanowires using cross-sectional shape control. A two-step top-down fabrication approach was employed to create straight nanowires with controllable rectangular cross-sections. A clear lasing threshold of 444 kW cm-2 and a narrow spectral line width of 0.16 nm were observed under optical pumping at room temperature, indicating the onset of lasing. The polarization was along the short dimension (y-direction) of the nanowire due to the higher transverse confinement factors for y-polarized transverse modes resulting from the rectangular nanowire cross-section. The results show that cross-sectioned shape control can enable inherent control over the polarization of nanowire lasers without additional environment requirements, such as placement onto lossy substrates.

  4. Defect Donor and Acceptor in GaN

    SciTech Connect

    Look, D.C.; Reynolds, D.C.; Hemsky, J.W.; Sizelove, J.R.; Jones, R.L.

    1997-09-01

    High-energy (0.7{endash}1MeV) electron irradiation in GaN grown on sapphire produces shallow donors and deep or shallow acceptors at equal rates, 1{plus_minus}0.2 cm{sup {minus}1}. The data, in conjunction with theory, are consistent only with the shallow donor being the N vacancy, and the acceptor the N interstitial. The N-vacancy donor energy is 64{plus_minus}10 meV, much larger than the value of 18meV found for the residual donor (probably Si) in this material. The Hall-effect measurements also reveal a degenerate n -type layer at the GaN/sapphire interface which must be accounted for to get the proper donor activation energy. {copyright} {ital 1997} {ital The American Physical Society}

  5. Surface photovoltage in undoped n-type GaN

    NASA Astrophysics Data System (ADS)

    Reshchikov, M. A.; Foussekis, M.; Baski, A. A.

    2010-06-01

    Steady-state and transient surface photovoltage (SPV) in undoped GaN is studied in vacuum and air ambient at room temperature and 400 K with a Kelvin probe. The results are explained within a phenomenological model accounting for the accumulation of photogenerated holes at the surface, capture of free electrons from the bulk over the near-surface potential barrier, and emission of electrons from surface states into the bulk. Simple analytical expressions are obtained and compared with experimental results. In particular, the proposed model explains the logarithmic decay of the SPV after stopping illumination. Internal and external mechanisms of the SPV are discussed in detail. It is shown that an internal mechanism dominates at low illumination intensity and/or small photon energies, while external mechanisms such as charging of a surface oxide layer and photoinduced processes play a significant role for above-bandgap illumination with sufficient intensity.

  6. Spatial distribution of defect luminescence in GaN nanowires.

    PubMed

    Li, Qiming; Wang, George T

    2010-05-12

    The spatial distribution of defect-related and band-edge luminescence from GaN nanowires grown by metal-organic chemical vapor deposition was studied by spatially resolved cathodoluminescence imaging and spectroscopy. A surface layer exhibiting strong yellow luminescence (YL) near 566 nm in the nanowires was revealed, compared to weak YL in the bulk. In contrast, other defect-related luminescence near 428 nm (blue luminescence) and 734 nm (red luminescence), in addition to band-edge luminescence (BEL) at 366 nm, were observed in the bulk of the nanowires but were largely absent at the surface. As the nanowire width approaches a critical dimension, the surface YL layer completely quenches the BEL. The surface YL is attributed to the diffusion and piling up of mobile point defects, likely isolated gallium vacancies, at the surface during growth. PMID:20392110

  7. Persistent photoconductivity in n-type GaN

    SciTech Connect

    Hirsch, M.T.; Wolk, J.A.; Walukiewicz, W.; Haller, E.E.

    1997-08-01

    We report on the spectral and temperature dependence of persistent photoconductivity (PPC) in metal-organic chemical vapor deposition grown unintentionally doped n-type GaN. The PPC effect is detectable up to temperatures of at least 352 K, the highest temperature used in this study. At 77 K, the conduction persists at a level 80{percent} higher than the equilibrium dark conduction for over 10{sup 4} s after removing the excitation. We have determined the spectral dependence for the optical cross section for PPC and obtain an optical ionization energy of {approximately}2.7 eV. The temperature dependence of the photoconductivity decay and its nonexponential shape are explained by a distribution of capture barriers with a mean capture barrier of 0.2 eV and a width of {approximately}26 meV. {copyright} {ital 1997 American Institute of Physics.}

  8. Microstructure of laterally overgrown GaN layers

    SciTech Connect

    Liliental-Weber, Zuzanna; Cherns, David

    2001-04-03

    Transmission electron microscopy study of plan-view and cross-section samples of epitaxial laterally overgrown (ELOG) GaN samples is described. Two types of dislocation with the same type of Burgers vector but different line direction have been observed. It is shown that threading edge dislocations bend to form dislocation segments in the c-plane as a result of shear stresses developed in the wing material along the stripe direction. It is shown that migration of these dislocations involves both glide and climb. Propagation of threading parts over the wing area is an indication of high density of point defects present in the wing areas on the ELOG samples. This finding might shed new light on the optical properties of such samples.

  9. MBE grown high quality GaN films and devices

    NASA Astrophysics Data System (ADS)

    Kim, W.; Aktas, O.; Salvador, A.; Botchkarev, A.; Sverdlov, B.; Mohammad, S. N.; Morkoç, H.

    1997-02-01

    GaN films with much improved structural, transport, and optical properties have been prepared by molecular beam epitaxy using NH 3 as a nitrogen source. Films with a wide range of resistivity, including highly resistive ones, were grown with a chosen growth rate of 1.2 μm/h. The electron mobility in modulation doped structures is about 450 and 850 cm 2/Vs at 300 and 77 K, respectively, with an areal carrier concentration of about 10 13 cm -2. Low temperature luminescence shows A- and B-free-excitons as well as the excited state of the A- and B-excitons, the first known observation, attesting to the quality of the samples. These transition energies are consistent with the best MOCVD samples and represent a sizable reduction of the pandemic zincblende phase in MBE grown films. The high quality of films was demonstrated by the realization of high performance MODFETs and Schottky diodes.

  10. GaN Based Electronics And Their Applications

    NASA Astrophysics Data System (ADS)

    Ren, Fan

    2002-03-01

    The Group III-nitrides were initially researched for their promise to fill the void for a blue solid state light emitter. Electronic devices from III-nitrides have been a more recent phenomenon. The thermal conductivity of GaN is three times that of GaAs. For high power or high temperature applications, good thermal conductivity is imperative for heat removal or sustained operation at elevated temperatures. The development of III-N and other wide bandgap technologies for high temperature applications will likely take place at the expense of competing technologies, such as silicon-on-insulator (SOI), at moderate temperatures. At higher temperatures (>300°C), novel devices and components will become possible. The automotive industry will likely be one of the largest markets for such high temperature electronics. One of the most noteworthy advantages for III-N materials over other wide bandgap semiconductors is the availability of AlGaN/GaN and InGaN/GaN heterostructures. A 2-dimensional electron gas (2DEG) has been shown to exist at the AlGaN/GaN interface, and heterostructure field effect transistors (HFETs) from these materials can exhibit 2DEG mobilities approaching 2000 cm2 / V?s at 300K. Power handling capabilities of 12 W/mm appear feasible, and extraordinary large signal performance has already been demonstrated, with a current state-of-the-art of >10W/mm at X-band. In this talk, high speed and high temperature AlGaN/GaN HEMTs as well as MOSHEMTs, high breakdown voltage GaN (>6KV) and AlGaN (9.7 KV) Schottky diodes, and their applications will be presented.

  11. Transition between wurtzite and zinc-blende GaN: An effect of deposition condition of molecular-beam epitaxy

    SciTech Connect

    Shi, B. M.; Xie, M. H.; Wu, H. S.; Wang, N.; Tong, S. Y.

    2006-10-09

    GaN exists in both wurtzite and zinc-blende phases and the growths of the two on its (0001) or (111) surfaces are achieved by choosing proper deposition conditions of molecular-beam epitaxy (MBE). At low substrate temperatures but high gallium fluxes, metastable zinc-blende GaN films are obtained, whereas at high temperatures and/or using high nitrogen fluxes, equilibrium wurtzite phase GaN epilayers resulted. This dependence of crystal structure on substrate temperature and source flux is not affected by deposition rate. Rather, the initial stage nucleation kinetics plays a primary role in determining the crystallographic structures of epitaxial GaN by MBE.

  12. High electron mobility GaN grown under N-rich conditions by plasma-assisted molecular beam epitaxy

    SciTech Connect

    Koblmueller, G.; Wu, F.; Mates, T.; Speck, J. S.; Fernandez-Garrido, S.; Calleja, E.

    2007-11-26

    An alternative approach is presented for the plasma-assisted molecular beam epitaxy of high-quality GaN. Under N-rich growth conditions, an unexpected layer-by-layer growth mode was found for a wide range of growth temperatures in the GaN thermal decomposition regime (>750 deg. C). Consequently, superior surface morphologies with roughness of less than 1 nm (rms) have been achieved. For lightly Si-doped GaN films, room-temperature electron mobilities exceeding 1100 cm{sup 2}/V s were measured, surpassing the commonly insulating nature of GaN grown under N-rich conditions at low temperature.

  13. Growth of high quality GaN layer on carbon nanotube-graphene network structure as intermediate layer

    NASA Astrophysics Data System (ADS)

    Seo, Taeo Hoon; Park, Ah Hyun; Park, Sungchan; Kim, Myung Jong; Suh, Eun-Kyung

    2015-03-01

    In general, high-quality GaN layers are synthesized on low-temperature (LT) GaN buffer layer on a single crystal sapphire substrate. However, large differences in fundamental properties such as lattice constants and thermal expansion coefficients between GaN layer and sapphire substrate generate high density of threading dislocation (TD) that leads to deterioration of optical and structural properties. Graphene has been attracting much attention due to its excellent physical properties However, direct epitaxial growth of GaN film onto graphene layer on substrates is not easily accessible due to the lack of chemical reactivity on graphene which consisted of C-C bond of sp2 hexagonally arranged carbon atoms with no dangling bonds. In this work, an intermediate layer for the GaN growth on sapphire substrate was constructed by inserting carbon nanotubes and graphene hybrid structure (CGH) Optical and structural properties of GaN layer grown on CGH were compared with those of GaN layer directly grown on sapphire CNTs act as nucleation sites and play a crucial role in the growth of single crystal high-quality GaN on graphene layer. Also, graphene film acts as a mask for epitaxial lateral overgrowth of GaN layer, which can effectively reduce TD density. A grant from the Korea Institute of Science and Technology (KIST) institutional program.

  14. Metal organic vapour phase epitaxy of GaN and lateral overgrowth

    NASA Astrophysics Data System (ADS)

    Gibart, Pierre

    2004-05-01

    Gallium nitride (GaN) is an extremely promising wide band gap semiconductor material for optoelectronics and high temperature, high power electronics. Actually, GaN is probably the most important semiconductor since silicon. However, achievement of its full potential has still been limited by a dramatic lack of suitable GaN bulk single crystals. GaN has a high melting temperature and a very high decomposition pressure; therefore it cannot be grown using conventional methods used for GaAs or Si like Czochraslski or Bridgman growths. Since there is no GaN bulk single crystal commercially available, all technological development of GaN-based devices relies on heteroepitaxy. Most of the current device structures are grown on sapphire or 6H-SiC. However, since their lattice parameters and thermal expansion coefficients are not well-matched to GaN, the epitaxial growth generates huge densities of defects, with threading dislocations (TDs) being the most prevalent (109-1011 cm-2). As a comparison, homoepitaxially grown GaAs exhibits ~102-104 dislocation cm-2, and homoepitaxial Si almost 0. Actually this large density of TDs in GaN drastically limits the performance and operating lifetime of nitride-based devices. Therefore, there is currently a tremendous technological effort to reduce these defects. Metal organic vapour phase epitaxy (MOVPE) is currently the most widely used technology. Actually, all optoelectronic commercial device structures are fabricated using MOVPE. In MOVPE, the most appropriate precursor for nitrogen is ammonia (NH3), whereas either trimethyl or triethylgallium may be used as a gallium source. MOVPE of GaN requires a high partial pressure of NH3, high growth temperatures (~1000-1100°C) and a growth chamber specially designed to avoid premature reactions between the ammonia and gallium alkyls. Since sapphire (or 6H-SiC) and GaN are highly mismatched, direct growth of GaN is impossible. Therefore, the growth of GaN on any substrate first requires

  15. High active nitrogen flux growth of GaN by plasma assisted molecular beam epitaxy

    SciTech Connect

    McSkimming, Brian M. Speck, James S.; Chaix, Catherine

    2015-09-15

    In the present study, the authors report on a modified Riber radio frequency (RF) nitrogen plasma source that provides active nitrogen fluxes more than 30 times higher than those commonly used for plasma assisted molecular beam epitaxy (PAMBE) growth of gallium nitride (GaN) and thus a significantly higher growth rate than has been previously reported. GaN films were grown using N{sub 2} gas flow rates between 5 and 25 sccm while varying the plasma source's RF forward power from 200 to 600 W. The highest growth rate, and therefore the highest active nitrogen flux, achieved was ∼7.6 μm/h. For optimized growth conditions, the surfaces displayed a clear step-terrace structure with an average RMS roughness (3 × 3 μm) on the order of 1 nm. Secondary ion mass spectroscopy impurity analysis demonstrates oxygen and hydrogen incorporation of 1 × 10{sup 16} and ∼5 × 10{sup 17}, respectively. In addition, the authors have achieved PAMBE growth of GaN at a substrate temperature more than 150 °C greater than our standard Ga rich GaN growth regime and ∼100 °C greater than any previously reported PAMBE growth of GaN. This growth temperature corresponds to GaN decomposition in vacuum of more than 20 nm/min; a regime previously unattainable with conventional nitrogen plasma sources. Arrhenius analysis of the decomposition rate shows that samples with a flux ratio below stoichiometry have an activation energy greater than decomposition of GaN in vacuum while samples grown at or above stoichiometry have decreased activation energy. The activation energy of decomposition for GaN in vacuum was previously determined to be ∼3.1 eV. For a Ga/N flux ratio of ∼1.5, this activation energy was found to be ∼2.8 eV, while for a Ga/N flux ratio of ∼0.5, it was found to be ∼7.9 eV.

  16. Metalorganic chemical vapor deposition growth of high-mobility AlGaN/AlN/GaN heterostructures on GaN templates and native GaN substrates

    SciTech Connect

    Chen, Jr-Tai Hsu, Chih-Wei; Forsberg, Urban; Janzén, Erik

    2015-02-28

    Severe surface decomposition of semi-insulating (SI) GaN templates occurred in high-temperature H{sub 2} atmosphere prior to epitaxial growth in a metalorganic chemical vapor deposition system. A two-step heating process with a surface stabilization technique was developed to preserve the GaN template surface. Utilizing the optimized heating process, a high two-dimensional electron gas mobility ∼2000 cm{sup 2}/V·s was obtained in a thin AlGaN/AlN/GaN heterostructure with an only 100-nm-thick GaN spacer layer homoepitaxially grown on the GaN template. This technique was also demonstrated viable for native GaN substrates to stabilize the surface facilitating two-dimensional growth of GaN layers. Very high residual silicon and oxygen concentrations were found up to ∼1 × 10{sup 20 }cm{sup −3} at the interface between the GaN epilayer and the native GaN substrate. Capacitance-voltage measurements confirmed that the residual carbon doping controlled by growth conditions of the GaN epilayer can be used to successfully compensate the donor-like impurities. State-of-the-art structural properties of a high-mobility AlGaN/AlN/GaN heterostructure was then realized on a 1 × 1 cm{sup 2} SI native GaN substrate; the full width at half maximum of the X-ray rocking curves of the GaN (002) and (102) peaks are only 21 and 14 arc sec, respectively. The surface morphology of the heterostructure shows uniform parallel bilayer steps, and no morphological defects were noticeable over the entire epi-wafer.

  17. Metalorganic chemical vapor deposition growth of high-mobility AlGaN/AlN/GaN heterostructures on GaN templates and native GaN substrates

    NASA Astrophysics Data System (ADS)

    Chen-Tai, Jr.; Hsu, Chih-Wei; Forsberg, Urban; Janzén, Erik

    2015-02-01

    Severe surface decomposition of semi-insulating (SI) GaN templates occurred in high-temperature H2 atmosphere prior to epitaxial growth in a metalorganic chemical vapor deposition system. A two-step heating process with a surface stabilization technique was developed to preserve the GaN template surface. Utilizing the optimized heating process, a high two-dimensional electron gas mobility ˜2000 cm2/V.s was obtained in a thin AlGaN/AlN/GaN heterostructure with an only 100-nm-thick GaN spacer layer homoepitaxially grown on the GaN template. This technique was also demonstrated viable for native GaN substrates to stabilize the surface facilitating two-dimensional growth of GaN layers. Very high residual silicon and oxygen concentrations were found up to ˜1 × 1020 cm-3 at the interface between the GaN epilayer and the native GaN substrate. Capacitance-voltage measurements confirmed that the residual carbon doping controlled by growth conditions of the GaN epilayer can be used to successfully compensate the donor-like impurities. State-of-the-art structural properties of a high-mobility AlGaN/AlN/GaN heterostructure was then realized on a 1 × 1 cm2 SI native GaN substrate; the full width at half maximum of the X-ray rocking curves of the GaN (002) and (102) peaks are only 21 and 14 arc sec, respectively. The surface morphology of the heterostructure shows uniform parallel bilayer steps, and no morphological defects were noticeable over the entire epi-wafer.

  18. Piezo-generator integrating a vertical array of GaN nanowires.

    PubMed

    Jamond, N; Chrétien, P; Houzé, F; Lu, L; Largeau, L; Maugain, O; Travers, L; Harmand, J C; Glas, F; Lefeuvre, E; Tchernycheva, M; Gogneau, N

    2016-08-12

    We demonstrate the first piezo-generator integrating a vertical array of GaN nanowires (NWs). We perform a systematic multi-scale analysis, going from single wire properties to macroscopic device fabrication and characterization, which allows us to establish for GaN NWs the relationship between the material properties and the piezo-generation, and to propose an efficient piezo-generator design. The piezo-conversion of individual MBE-grown p-doped GaN NWs in a dense array is assessed by atomic force microscopy (AFM) equipped with a Resiscope module yielding an average output voltage of 228 ± 120 mV and a maximum value of 350 mV generated per NW. In the case of p-doped GaN NWs, the piezo-generation is achieved when a positive piezo-potential is created inside the nanostructures, i.e. when the NWs are submitted to compressive deformation. The understanding of the piezo-generation mechanism in our GaN NWs, gained from AFM analyses, is applied to design a piezo-generator operated under compressive strain. The device consists of NW arrays of several square millimeters in size embedded into spin-on glass with a Schottky contact for rectification and collection of piezo-generated carriers. The generator delivers a maximum power density of ∼12.7 mW cm(-3). This value sets the new state of the art for piezo-generators based on GaN NWs and more generally on nitride NWs, and offers promising prospects for the use of GaN NWs as high-efficiency ultra-compact energy harvesters. PMID:27363777

  19. Piezo-generator integrating a vertical array of GaN nanowires

    NASA Astrophysics Data System (ADS)

    Jamond, N.; Chrétien, P.; Houzé, F.; Lu, L.; Largeau, L.; Maugain, O.; Travers, L.; Harmand, J. C.; Glas, F.; Lefeuvre, E.; Tchernycheva, M.; Gogneau, N.

    2016-08-01

    We demonstrate the first piezo-generator integrating a vertical array of GaN nanowires (NWs). We perform a systematic multi-scale analysis, going from single wire properties to macroscopic device fabrication and characterization, which allows us to establish for GaN NWs the relationship between the material properties and the piezo-generation, and to propose an efficient piezo-generator design. The piezo-conversion of individual MBE-grown p-doped GaN NWs in a dense array is assessed by atomic force microscopy (AFM) equipped with a Resiscope module yielding an average output voltage of 228 ± 120 mV and a maximum value of 350 mV generated per NW. In the case of p-doped GaN NWs, the piezo-generation is achieved when a positive piezo-potential is created inside the nanostructures, i.e. when the NWs are submitted to compressive deformation. The understanding of the piezo-generation mechanism in our GaN NWs, gained from AFM analyses, is applied to design a piezo-generator operated under compressive strain. The device consists of NW arrays of several square millimeters in size embedded into spin-on glass with a Schottky contact for rectification and collection of piezo-generated carriers. The generator delivers a maximum power density of ∼12.7 mW cm‑3. This value sets the new state of the art for piezo-generators based on GaN NWs and more generally on nitride NWs, and offers promising prospects for the use of GaN NWs as high-efficiency ultra-compact energy harvesters.

  20. Crystallographically tilted and partially strain relaxed GaN grown on inclined (111) facets etched on Si(100) substrate

    SciTech Connect

    Ansah Antwi, K. K.; Soh, C. B.; Wee, Q.; Tan, Rayson J. N.; Tan, H. R.; Yang, P.; Sun, L. F.; Shen, Z. X.; Chua, S. J.

    2013-12-28

    High resolution X-ray diffractometry (HR-XRD), Photoluminescence, Raman spectroscopy, and Transmission electron microscope measurements are reported for GaN deposited on a conventional Si(111) substrate and on the (111) facets etched on a Si(100) substrate. HR-XRD reciprocal space mappings showed that the GaN(0002) plane is tilted by about 0.63° ± 0.02° away from the exposed Si(111) growth surface for GaN deposited on the patterned Si(100) substrate, while no observable tilt existed between the GaN(0002) and Si(111) planes for GaN deposited on the conventional Si(111) substrate. The ratio of integrated intensities of the yellow to near band edge (NBE) luminescence (I{sub YL}/I{sub NBE}) was determined to be about one order of magnitude lower in the case of GaN deposited on the patterned Si(100) substrate compared with GaN deposited on the conventional Si(111) substrate. The Raman E{sub 2}(high) optical phonon mode at 565.224 ± 0.001 cm{sup −1} with a narrow full width at half maximum of 1.526 ± 0.002 cm{sup −1} was measured, for GaN deposited on the patterned Si(100) indicating high material quality. GaN deposition within the trench etched on the Si(100) substrate occurred via diffusion and mass-transport limited mechanism. This resulted in a differential GaN layer thickness from the top (i.e., 1.8 μm) of the trench to the bottom (i.e., 0.3 μm) of the trench. Mixed-type dislocation constituted about 80% of the total dislocations in the GaN grown on the inclined Si(111) surface etched on Si(100)

  1. GaN Initiative for Grid Applications (GIGA)

    SciTech Connect

    Turner, George

    2015-07-03

    For nearly 4 ½ years, MIT Lincoln Laboratory (MIT/LL) led a very successful, DoE-funded team effort to develop GaN-on-Si materials and devices, targeting high-voltage (>1 kV), high-power, cost-effective electronics for grid applications. This effort, called the GaN Initiative for Grid Applications (GIGA) program, was initially made up of MIT/LL, the MIT campus group of Prof. Tomas Palacios (MIT), and the industrial partner M/A Com Technology Solutions (MTS). Later in the program a 4th team member was added (IQE MA) to provide commercial-scale GaN-on-Si epitaxial materials. A basic premise of the GIGA program was that power electronics, for ubiquitous utilization -even for grid applications - should be closer in cost structure to more conventional Si-based power electronics. For a number of reasons, more established GaN-on-SiC or even SiC-based power electronics are not likely to reach theses cost structures, even in higher manufacturing volumes. An additional premise of the GIGA program was that the technical focus would be on materials and devices suitable for operating at voltages > 1 kV, even though there is also significant commercial interest in developing lower voltage (< 1 kV), cost effective GaN-on-Si devices for higher volume applications, like consumer products. Remarkable technical progress was made during the course of this program. Advances in materials included the growth of high-quality, crack-free epitaxial GaN layers on large-diameter Si substrates with thicknesses up to ~5 μm, overcoming significant challenges in lattice mismatch and thermal expansion differences between Si and GaN in the actual epitaxial growth process. Such thick epilayers are crucial for high voltage operation of lateral geometry devices such as Schottky barrier (SB) diodes and high electron mobility transistors (HEMTs). New “Normally-Off” device architectures were demonstrated – for safe operation of power electronics circuits. The trade-offs between lateral and

  2. Nanostructural engineering of nitride nucleation layers for GaN substrate dislocation reduction.

    SciTech Connect

    Koleske, Daniel David; Lee, Stephen Roger; Lemp, Thomas Kerr; Coltrin, Michael Elliott; Cross, Karen Charlene; Thaler, Gerald

    2009-07-01

    With no lattice matched substrate available, sapphire continues as the substrate of choice for GaN growth, because of its reasonable cost and the extensive prior experience using it as a substrate for GaN. Surprisingly, the high dislocation density does not appear to limit UV and blue LED light intensity. However, dislocations may limit green LED light intensity and LED lifetime, especially as LEDs are pushed to higher current density for high end solid state lighting sources. To improve the performance for these higher current density LEDs, simple growth-enabled reductions in dislocation density would be highly prized. GaN nucleation layers (NLs) are not commonly thought of as an application of nano-structural engineering; yet, these layers evolve during the growth process to produce self-assembled, nanometer-scale structures. Continued growth on these nuclei ultimately leads to a fully coalesced film, and we show in this research program that their initial density is correlated to the GaN dislocation density. In this 18 month program, we developed MOCVD growth methods to reduce GaN dislocation densities on sapphire from 5 x 10{sup 8} cm{sup -2} using our standard delay recovery growth technique to 1 x 10{sup 8} cm{sup -2} using an ultra-low nucleation density technique. For this research, we firmly established a correlation between the GaN nucleation thickness, the resulting nucleation density after annealing, and dislocation density of full GaN films grown on these nucleation layers. We developed methods to reduce the nuclei density while still maintaining the ability to fully coalesce the GaN films. Ways were sought to improve the GaN nuclei orientation by improving the sapphire surface smoothness by annealing prior to the NL growth. Methods to eliminate the formation of additional nuclei once the majority of GaN nuclei were developed using a silicon nitride treatment prior to the deposition of the nucleation layer. Nucleation layer thickness was determined

  3. Stress reduction in epitaxial GaN films on Si using cubic SiC as intermediate layers

    NASA Astrophysics Data System (ADS)

    Komiyama, Jun; Abe, Yoshihisa; Suzuki, Shunichi; Nakanishi, Hideo

    2006-08-01

    Stress in the epitaxial films of GaN on Si is reduced by using SiC as intermediate layers. The crystalline films of cubic SiC (0-1μm), thin AlN (50nm), and GaN (1-3μm) were prepared on 3in. (1 1 1) Si substrates—stacked in the order of GaN /AlN/SiC/Si—by metalorganic vapor-phase epitaxy. It is revealed by Raman spectroscopy that the tensile stress in GaN is reduced to half (reduction of about 300MPa) for GaN on Si with SiC intermediate layers compared with GaN on Si without SiC intermediate layers. Because of stress reduction, crack-free GaN on Si with a thickness of 2μm was obtained by using SiC intermediate layers. Cracking was minimized even on thicker GaN on Si (3μm thick) with SiC intermediate layers. The SiC intermediate layers are promising for the realization of nitride based electronic devices on Si.

  4. Demonstration of crystal-vapor equilibrium leading to growth blockade of GaN during selective area growth

    NASA Astrophysics Data System (ADS)

    André, Y.; Trassoudaine, A.; Gil, E.; Lekhal, K.; Chelda-Gourmala, O.; Castelluci, D.; Cadoret, R.

    2012-09-01

    The synthesis of GaN by selective area growth using Hydride Vapor Phase Epitaxy (SAG-HVPE) is reported for stripes patterned along <11bar00 > and <112bar0>GaN on c-plane sapphire substrates. A systematic control of the GaN morphologies was carried out by both cross-sectional and surface Scanning Electron Microscopy (SEM). A complete HVPE cartography of GaN-SAG revealed domains of zero growth rates at high concentration of hydrogen in the carrier gas. The determination of the mechanisms that govern the growth of GaN morphologies was particularly emphasized. A theoretical model based on thermodynamic and kinetic analyses of the grown (0001) GaN layers was discussed, in combination with experiments on unmasked (0001) GaN and patterned GaN/c-plane sapphire substrates. Long HVPE runs were performed to demonstrate that the prevailing growth mechanism, for high hydrogen concentration in the carrier gas, is a mechanism based on a dechlorination by GaCl2 gas species. This mechanism leads to growth blockade of GaN growth and constitutes a very interesting issue for shaping GaN material as an alternative to top-down micro- and nano-technologies.

  5. Comparison of the microstructural characterizations of GaN layers grown on Si (111) and on sapphire

    NASA Astrophysics Data System (ADS)

    Shin, Huiyoun; Jeon, Kisung; Jang, Youngil; Gang, Mingu; Choi, Myungshin; Park, Wonhwa; Park, Kyuho

    2013-10-01

    Due to the large differences in the lattice constants and the thermal expansion coefficients between GaN and Si, GaN growth on a Si substrate usually leads initially to high defect densities and cracks. If high-quality GaN films on Si substrate are to be obtained, it is essential to understand the different growth characteristics of GaN layers grown on Si and on sapphire. In this study, the GaN specimens were grown on sapphire and Si (111) substrates with AlGaN and AlN buffer layers, respectively, by metalorganic chemical vapor deposition (MOCVD). Using transmission electron microscopy (TEM) and micro-Raman spectroscope, we carried out a comparative investigation of GaN growth by characterizing lattice coherency, defect density, and residual strain. These analyses revealed that the GaN layers grown on Si have much residual tensile strain and that strain has an effect on the formation of InGaN/GaN multiple quantum wells (MQWs) above the GaN layers.

  6. Influence of growth temperature and temperature ramps on deep level defect incorporation in m-plane GaN

    NASA Astrophysics Data System (ADS)

    Armstrong, A. M.; Kelchner, K.; Nakamura, S.; DenBaars, S. P.; Speck, J. S.

    2013-12-01

    The dependence of deep level defect incorporation in m-plane GaN films grown by metal-organic chemical vapor deposition on bulk m-plane GaN substrates as a function of growth temperature (Tg) and Tg ramping method was investigated using deep level optical spectroscopy. Understanding the influence of Tg on GaN deep level incorporation is important for InGaN/GaN multi-quantum well (MQW) light emitting diodes (LEDs) and laser diodes (LDs) because GaN quantum barrier (QB) layers are grown much colder than thin film GaN to accommodate InGaN QW growth. Deep level spectra of low Tg (800 °C) GaN films grown under QB conditions were compared to deep level spectra of high Tg (1150 °C) GaN. Reducing Tg, increased the defect density significantly (>50×) through introduction of emergent deep level defects at 2.09 eV and 2.9 eV below the conduction band minimum. However, optimizing growth conditions during the temperature ramp when transitioning from high to low Tg substantially reduced the density of these emergent deep levels by approximately 40%. The results suggest that it is important to consider the potential for non-radiative recombination in QBs of LED or LD active regions, and tailoring the transition from high Tg GaN growth to active layer growth can mitigate such non-radiative channels.

  7. Photoluminescence of GaN Film Exposed to Chlorine-Containing Plasma

    NASA Astrophysics Data System (ADS)

    Ogawa, Daisuke; Banno, Yoshitsugu; Nakano, Yoshitaka; Nakamura, Keiji

    2015-09-01

    Gallium nitride (GaN) has been an attractive semiconductor material for the application to not only light emitting diodes, but also high power devices. The advantage of the material is that it can be fabricated to maximize the number density of devices a single wafer. In our current technology, we mainly utilize low-temperature plasma for dry etching. In fact, GaN generally requires chlorine-containing plasma for chemical etching. However, the use of plasma has a drawback that can induce unwanted changes on the fabricating devices in some conditions. This is called as plasma-induced damage (PID). We have so far monitored the development of PIDs with photoluminescence (PL) emitted from the GaN surface during argon plasma process. In this time, we exposed a GaN film to chlorine-containing plasma and monitored the PID development. Our PL measurements show that the chlorine-containing plasma almost gave no change in PL property of GaN, while argon plasma gave drastic changes. This is because the speed of etching by chlorine species was faster than the speed of damage creations by plasma. In this presentation, we will show further results of this experiment along with some analyses for the purpose of industrial application.

  8. Effects of catalyst concentration and ultraviolet intensity on chemical mechanical polishing of GaN

    NASA Astrophysics Data System (ADS)

    Wang, Jie; Wang, Tongqing; Pan, Guoshun; Lu, Xinchun

    2016-08-01

    Effects of catalyst concentration and ultraviolet intensity on chemical mechanical polishing (CMP) of GaN were deeply investigated in this paper. Working as an ideal homogeneous substrate material in LED industry, GaN ought to be equipped with a smooth and flat surface. Taking the strong chemical stability of GaN into account, photocatalytic oxidation technology was adopted in GaN CMP process to realize efficient removal. It was found that, because of the improved reaction rate of photocatalytic oxidation, GaN material removal rate (MRR) increases by a certain extent with catalyst concentration increasing. Cross single line analysis on the surface after polishing by Phase Shift MicroXAM-3D was carried out to prove the better removal effect with higher catalyst concentration. Ultraviolet intensity field in H2O2-SiO2-based polishing system was established and simulated, revealing the variation trend of ultraviolet intensity around the outlet of the slurry. It could be concluded that, owing to the higher planarization efficiency and lower energy damage, the UV lamp of 125 W is the most appropriate lamp in this system. Based on the analysis, defects removal model of this work was proposed to describe the effects of higher catalyst concentration and higher power of UV lamp.

  9. Nanopore morphology in porous GaN template and its effect on the LEDs emission

    NASA Astrophysics Data System (ADS)

    Soh, C. B.; Tay, C. B.; Tan, Rayson J. N.; Vajpeyi, A. P.; Seetoh, I. P.; Ansah-Antwi, K. K.; Chua, S. J.

    2013-09-01

    GaN grown on sapphire is electrochemically etched in HF and in KOH. Etching in HF results in a network of nanopillars while that etched in KOH results in a network of pores. The higher density of voids from the network of pores shows the highest strain relaxation for a 1.2 µm thick GaN overgrown on the porous templates. In general, a light-emitting diode (LED) on the porous templates gives about 1.5 times higher intensity and a spectral envelop shift towards the red due to a higher In incorporation. The higher intensity is attributed to enhanced light extraction due to light scattering at the voids formed from the pores and improved material quality with dislocation reduction. The formation of larger overgrowth GaN islands which merges to give a continuous GaN film over the porous template reduced the dislocation density and also accounted for higher strain relaxation for the growth of the quantum dots (QDs) and quantum well layers. This reduced the extent of peak shift of LEDs grown on porous GaN template and improved its performance.

  10. Ultrathin GaN quantum disk nanowire LEDs with sub-250 nm electroluminescence

    NASA Astrophysics Data System (ADS)

    Sarwar, A. T. M. Golam; May, Brelon J.; Chisholm, Matthew F.; Duscher, Gerd J.; Myers, Roberto C.

    2016-04-01

    By quantum confining GaN at monolayer thickness with AlN barriers inside of a nanowire, deep ultraviolet LEDs are demonstrated. Full three-dimensional strain dependent energy band simulations are carried out within multiple quantum disk (MQD) GaN/AlN nanowire superlattice heterostructures. It is found that, even within the same nanowire MQD, the emission energy of the ultrathin GaN QDs varies from disk to disk due to the changing strain distribution and polarization charge induced energy band bending along the axial nanowire direction. MQD heterostructures are grown by plasma-assisted molecular beam epitaxy to form self-assembled catalyst-free nanowires with 1 to 2 monolayer thick GaN insertions within an AlN matrix. Photoluminescence peaks are observed at 295 nm and 283 nm from the 2 ML and 1 ML thick MQD samples, respectively. Polarization-doped nanowire LEDs are grown incorporating 1 ML thick GaN MQD active regions from which we observe deep ultraviolet electroluminescence. The shortest LED wavelength peak observed is 240 nm and attributed to electron hole recombination within 1 ML thick GaN QDs.

  11. Nanoscale lateral epitaxial overgrowth of GaN on Si (111)

    SciTech Connect

    Zang, K.Y.; Wang, Y.D.; Chua, S.J.; Wang, L.S.

    2005-11-07

    We demonstrate that GaN can selectively grow by metalorganic chemical vapor deposition into the pores and laterally over the nanoscale patterned SiO{sub 2} mask on a template of GaN/AlN/Si. The nanoporous SiO{sub 2} on GaN surface with pore diameter of approximately 65 nm and pore spacing of 110 nm was created by inductively coupled plasma etching using anodic aluminum oxide template as a mask. Cross-section transmission electron microscopy shows that the threading-dislocation density was largely reduced in this nanoepitaxial lateral overgrowth region. Dislocations parallel to the interface are the dominant type of dislocations in the overgrown layer of GaN. A large number of the threading dislocations were filtered by the nanoscale mask, which leads to the dramatic reduction of the threading dislocations during the growth within the nano-openings. More importantly, due to the nanoscale size of the mask area, the very fast coalescence and subsequent lateral overgrowth of GaN force the threading dislocations to bend to the basal plane within the first 50 nm of the film thickness. The structure of overgrown GaN is a truncated hexagonal pyramid which is covered with six {l_brace}1101{r_brace} side facets and (0001) top surface depending on the growth conditions.

  12. Synthesis and field emission studies of tower-like GaN nanowires

    PubMed Central

    2014-01-01

    Tower-like GaN nanowires were successfully fabricated on Au-coated Si substrates by chemical vapor deposition. The tower-like nanowire consisted of a nanowire at the center and microcrystal layers stacked one by one around the nanowire. The tower-like nanowires grew along the [0001] direction, and the exposed surfaces of the microcrystal layers are 101¯1 and 101¯1¯ facets. The growth mechanism of the tower-like GaN nanowires was proposed. The field emission property of tower-like GaN nanowires was tested. Due to the sharp tips, nearly vertical alignment and rough surfaces caused by the microcrystal layers, the tower-like GaN nanowires show excellent performance in field emission with a turn-on field of 2.44 V/μm which is lower than those of other GaN one-dimensional (1D) nanomaterials. PACS 81.15.Gh; 68.37.Lp; 68.37.Vj PMID:25404876

  13. Characterization of the Erwinia chrysanthemi Gan locus, involved in galactan catabolism.

    PubMed

    Delangle, Aurélie; Prouvost, Anne-France; Cogez, Virginie; Bohin, Jean-Pierre; Lacroix, Jean-Marie; Cotte-Pattat, Nicole Hugouvieux

    2007-10-01

    beta-1,4-Galactan is a major component of the ramified regions of pectin. Analysis of the genome of the plant pathogenic bacteria Erwinia chrysanthemi revealed the presence of a cluster of eight genes encoding proteins potentially involved in galactan utilization. The predicted transport system would comprise a specific porin GanL and an ABC transporter made of four proteins, GanFGK(2). Degradation of galactans would be catalyzed by the periplasmic 1,4-beta-endogalactanase GanA, which released oligogalactans from trimer to hexamer. After their transport through the inner membrane, oligogalactans would be degraded into galactose by the cytoplasmic 1,4-beta-exogalactanase GanB. Mutants affected for the porin or endogalactanase were unable to grow on galactans, but they grew on galactose and on a mixture of galactotriose, galactotetraose, galactopentaose, and galactohexaose. Mutants affected for the periplasmic galactan binding protein, the transporter ATPase, or the exogalactanase were only able to grow on galactose. Thus, the phenotypes of these mutants confirmed the functionality of the gan locus in transport and catabolism of galactans. These mutations did not affect the virulence of E. chrysanthemi on chicory leaves, potato tubers, or Saintpaulia ionantha, suggesting an accessory role of galactan utilization in the bacterial pathogeny. PMID:17644603

  14. Characterization of the Erwinia chrysanthemi gan Locus, Involved in Galactan Catabolism▿ †

    PubMed Central

    Delangle, Aurélie; Prouvost, Anne-France; Cogez, Virginie; Bohin, Jean-Pierre; Lacroix, Jean-Marie; Cotte-Pattat, Nicole Hugouvieux

    2007-01-01

    β-1,4-Galactan is a major component of the ramified regions of pectin. Analysis of the genome of the plant pathogenic bacteria Erwinia chrysanthemi revealed the presence of a cluster of eight genes encoding proteins potentially involved in galactan utilization. The predicted transport system would comprise a specific porin GanL and an ABC transporter made of four proteins, GanFGK2. Degradation of galactans would be catalyzed by the periplasmic 1,4-β-endogalactanase GanA, which released oligogalactans from trimer to hexamer. After their transport through the inner membrane, oligogalactans would be degraded into galactose by the cytoplasmic 1,4-β-exogalactanase GanB. Mutants affected for the porin or endogalactanase were unable to grow on galactans, but they grew on galactose and on a mixture of galactotriose, galactotetraose, galactopentaose, and galactohexaose. Mutants affected for the periplasmic galactan binding protein, the transporter ATPase, or the exogalactanase were only able to grow on galactose. Thus, the phenotypes of these mutants confirmed the functionality of the gan locus in transport and catabolism of galactans. These mutations did not affect the virulence of E. chrysanthemi on chicory leaves, potato tubers, or Saintpaulia ionantha, suggesting an accessory role of galactan utilization in the bacterial pathogeny. PMID:17644603

  15. Ferromagnetism and Photoluminescence in Rare-Earth doped GaN via Diffusion

    NASA Astrophysics Data System (ADS)

    Luen, M. Oliver; Nepal, N.; Bedair, S. M.; Zavada, J. M.; Brown, Ei Ei; Hommerich, U.; Frajtag, P.; El-Masry, N. A.

    2009-03-01

    Rare-earth doped GaN is attracting attention both as a diluted magnetic semiconductor (DMS) material and for optical devices useful in communications and multi-color semiconductor display technology. GaN's large band gap (3.4 eV) gives rise to optical transparency over a wide spectral range, from the infrared (IR) to the ultraviolet. These properties make it an optimum host for the various emissions that are possible from rare-earth (RE) ions. Recently, rare-earth doped GaN also has demonstrated above room temperature ferromagnetism. In this study, we report the diffusion of RE (Nd, Sm, Gd and Er) into undoped, Mg-doped and Si-doped GaN templates. Room temperature optical and ferromagnetic properties were studied using photoluminescence (PL) and alternating gradient magnetometer, respectively. Ferromagnetic properties show a preference for undoped and n-type GaN. PL spectra exhibit RE ion inner shell transitions in the visible and infrared regions. The mechanisms for above room temperature ferromagnetism and emission intensity related to the RE concentration, is discussed.

  16. Low temperature inorganic chemical vapor deposition of heteroepitaxial GaN

    NASA Astrophysics Data System (ADS)

    McMurran, Jeffrey; Todd, M.; Kouvetakis, J.; Smith, David J.

    1996-07-01

    We have developed a highly efficient method of growing thin oriented films of GaN on basal plane sapphire and (100) Si substrates using an exclusively inorganic single-source precursor free of carbon and hydrogen. Cross sectional transmission electron microscopy of the highly conformal films revealed columnar material growth on Si and heteroepitaxial columnar growth of crystalline GaN on sapphire. Rutherford backscattering spectroscopy (RBS) of layers grown at 700 °C confirmed stoichiometric GaN. Auger and RBS oxygen and carbon resonance profiles indicated that the films were pure and highly homogeneous. With respect to current chemical vapor deposition processes for GaN growth, our approach offers a number of potentially important improvements. These include high growth rates of 5-350 nm/min, low deposition temperature of 650-700 °C, nearly ideal Ga-N stoichiometry, elimination of the highly inefficient use of toxic ammonia, and a carbon-hydrogen free growth environment that could prove to be beneficial to p-doping processes.

  17. Synthesis, microstructure, and cathodoluminescence of [0001]-oriented GaN nanorods grown on conductive graphite substrate.

    PubMed

    Yuan, Fang; Liu, Baodan; Wang, Zaien; Yang, Bing; Yin, Yao; Dierre, Benjamin; Sekiguchi, Takashi; Zhang, Guifeng; Jiang, Xin

    2013-11-27

    One-dimensional GaN nanorods with corrugated morphology have been synthesized on graphite substrate without the assistance of any metal catalyst through a feasible thermal evaporation process. The morphologies and microstructures of GaN nanorods were characterized by X-ray powder diffraction (XRD), scanning electron microscopy (SEM) and high-resolution transmission electron microscopy (HRTEM). The results from HRTEM analysis indicate that the GaN nanorods are well-crystallized and exhibit a preferential orientation along the [0001] direction with Ga(3+)-terminated (101̅1) and N(3-)-terminated (101̅1̅) as side facets, finally leading to the corrugated morphology surface. The stabilization of the electrostatic surface energy of {101̅1} polar surface in a wurtzite-type hexagonal structure plays a key role in the formation of GaN nanorods with corrugated morphology. Room-temperature cathodoluminescence (CL) measurements show a near-band-edge emission (NBE) in the ultraviolet range and a broad deep level emission (DLE) in the visible range. The crystallography and the optical emissions of GaN nanorods are discussed. PMID:24164686

  18. Properties of Gallium Disorder and Gold Implants in GaN

    SciTech Connect

    Jiang, Weilin; Weber, William J.; Thevuthasan, Suntharampillai; Shutthanandan, V; DB Poker, SC Moss, K-H Heinig

    2001-04-25

    Epitaxial single-crystal GaN films on sapphire were implanted 60? off the <0001> surface normal with 1 MeV Auor 3 MeV Au over a fluence range from 0.88 to 86.2 ions/nm2 at 180 and 300 K. The implantation damage was studied in-situ using 2 MeV He Rutherford backscattering spectrometry in channeling geometry (RBS/C). The disordering rate in the near-surface region is faster than at the damage peak. In all cases, results show an intermediate stage of Ga disorder saturation at the damage peak. Migration of Au implants in GaN is observed during ion implantation at 300 K. As a result of thermal annealing at 870 K for 20 min, some Au implants in GaN diffuse into the amorphized surface region, while the remaining Au atoms distribute around the mean ion-projected-range. These results suggest a high mobility of both Ga defects and Au implants in GaN. Deeper damage implantation by 3 MeV Au indicates that GaN cannot be completely amorphized up to the highest ion fluence (86.2 ions/nm) applied at 300 K.

  19. Transport properties, specific heat and thermal conductivity of GaN nanocrystalline ceramic

    SciTech Connect

    Sulkowski, Czeslaw; ChuchmaLa, Andrzej; Zaleski, Andrzej J.; Matusiak, Marcin; Mucha, Jan; GLuchowski, PaweL; Strek, WiesLaw

    2010-10-15

    The structural and transport properties (resistivity, thermopower and Hall effect), specific heat and thermal conductivity have been measured for GaN nanocrystalline ceramic prepared by hot pressing. It was found that the temperature dependence of resistivity in temperature range 10-300 K shows the very low activation energy, which is ascribed to the shallow donor doping originating in amorphous phase of sample. The major charge carriers are electrons, what is indicated by negative sign of Hall constant and Seebeck coefficient. The thermopower attains large values (-58 {mu}V/K at 300 K) and was characterized by linear temperature dependence which suggests the diffusion as a major contribution to Seebeck effect. The high electron concentration of 1.3x10{sup 19} cm{sup -3} and high electronic specific heat coefficient determined to be 2.4 mJ/molK{sup 2} allow to conclude that GaN ceramic demonstrates the semimetallic-like behavior accompanied by very small mobility of electrons ({approx}0.1 cm{sup 2}/V s) which is responsible for its high resistivity. A low heat conductivity of GaN ceramics is associated with partial amorphous phase of GaN grains due to high pressure sintering. - Graphical Abstract: Thermal resistivity and thermopower measurements indicates the high phonon scattering and lack of phonon-drag contribution to thermopower in GaN nanoceramics pressed under 4 GPa at 800 {sup o}C.

  20. Deep levels and persistent photoconductivity in GaN thin films

    SciTech Connect

    Qiu, C.H.; Pankove, J.I.

    1997-04-01

    Photocurrent decay in GaN thin films was studied in the time span from a few seconds to several days. The persistent photoconductivity (PPC) behavior was observed not only in Mg-doped {ital p}-type GaN films but also in undoped {ital n}-type GaN films. The photoconductivity spectra and the photocurrent response time were measured using a weak probe light at several times after the samples had been kept in the dark. During the relaxation, the photocurrent due to the subband-gap probe light decreased more than the photocurrent due to the UV probe light. It is suggested that metastable centers at 1.1, 1.40, and 2.04 eV above the valence band edge are responsible for the PPC behavior in Mg-doped GaN, and that Ga vacancy is the candidate for PPC effect in {ital n}-type GaN. {copyright} {ital 1997 American Institute of Physics.}

  1. UV Photodetectors using Vertically-aligned GaN n-core/p-shell Arrays

    NASA Astrophysics Data System (ADS)

    Ha, Jong-Yoon; Krylyuk, Sergiy; Paramanik, Dipak; Debnath, Ratan; Davydov, Albert; King, Matthew; Motayed, Abhishek

    2013-03-01

    The fabrication methods of GaN nanostructures, such as vertically aligned core-shell nano- and micro- pillar arrays, are critical for device applications. We have demonstrated dense arrays of vertically-oriented, individual GaN core-shell structures realized by a combination of top-down etching of the n-type pillars and subsequent p-shell epitaxial growth using selective CVD. The patterned samples were then etched in an inductively coupled plasma system to form GaN pillars. Mg-doped p-type GaN shells were then epitaxially grown over the n-GaN pillars in a custom-built horizontal hot-wall halide vapor phase epitaxy (HVPE) reactor. Room-temperature photoluminescence and Raman spectroscopy measurements indicate strain-relaxation in the etched pillars compared to the as-grown GaN film. Complete devices have been fabricated using dielectric planarization Detailed device characterization was correlated with TEM microstructural analysis. IREAP, University of Maryland, College Park, MD 20742

  2. Thermal evolution of microstructure in ion-irradiated GaN

    SciTech Connect

    Bae, In-Tae; Jiang, Weilin; Wang, Chong M.; Weber, William J.; Zhang, Yanwen

    2009-04-20

    The thermal evolution of the microstructure created by irradiation of a GaN single crystal with 2 MeV Au2+ ions at 150 K is characterized following annealing at 973 K using transmission electron microscopy. In the as-irradiated sample characterized at 300 K, Ga nanocrystals with the diamond structure, which is an unstable configuration for Ga, are directly observed together with nitrogen bubbles in the irradiation-induced amorphous layer. Upon thermal annealing, the thickness of the amorphous layer decreases by ~13.1 %, and nano-beam electron diffraction analysis indicates no evidence for residual Ga nanocrystals, but instead reveals a mixture of hexagonal and cubic GaN phases in the annealed sample. Nitrogen molecules, captured in the as-irradiated bubbles, appear to debond and react with the Ga nanocrystals during the thermal annealing to form crystalline GaN. In addition, electron energy loss spectroscopy measurements reveal an atomic volume change of 18.9 % for the as-irradiated amorphous layer relative to the virgin single crystal GaN. This relative swelling of the damaged layer reduces to 7.7 % after thermal annealing. Partial recrystallization and structural relaxation of the GaN amorphous state are believed responsible for the volume change.

  3. Distribution of the lateral correlation length in GaN epitaxial layers

    NASA Astrophysics Data System (ADS)

    Kozlowski, J.; Paszkiewicz, R.; Korbutowicz, R.; Tlaczala, M.

    2001-12-01

    GaN structures belong to the most popular wide-bandgap semiconductors. Large lattice mismatch existing between the layer and substrates (3.5% for SiC and even 16% in the case of sapphire substrate) results in structures with a large number of defects. The typical GaN epitaxial layer consists of dislocation-free regions with lateral dimensions equal to a few hundred nanometers. The dislocation density changes from 10 8 cm -2 inside the grains to 10 10 cm -2 in the grain boundaries. The average value of the lateral correlation lengths (coherence wavelength) seems to be not quite satisfactory. Particularly, it is connected with lateral direction, because the vertical length is approximately equal to the thickness of the epitaxial layer. This paper presents the new approach for the determination of GaN crystallites dislocation-free block size distributions. This method is based on the X-ray peak profile analysis and solution of the Fredholm integral equation. The necessary peaks are obtained from the high-resolution X-ray diffractometry measurements. The obtained results have been shown for the various samples: GaN layers grown on low temperature buffer layer (GaN or AlN). Very interesting results were obtained in the first case, where two different sizes of the blocks appear.

  4. Electron spin relaxation in two polymorphic structures of GaN

    NASA Astrophysics Data System (ADS)

    Kang, Nam Lyong

    2015-03-01

    The relaxation process of electron spin in systems of electrons interacting with piezoelectric deformation phonons that are mediated through spin-orbit interactions was interpreted from a microscopic point of view using the formula for the electron spin relaxation times derived by a projection-reduction method. The electron spin relaxation times in two polymorphic structures of GaN were calculated. The piezoelectric material constant for the wurtzite structure obtained by a comparison with a previously reported experimental result was {{P}pe}=1.5 × {{10}29} eV {{m}-1}. The temperature and magnetic field dependence of the relaxation times for both wurtzite and zinc-blende structures were similar, but the relaxation times in zinc-blende GaN were smaller and decreased more rapidly with increasing temperature and magnetic field than that in wurtzite GaN. This study also showed that the electron spin relaxation for wurtzite GaN at low density could be explained by the Elliot-Yafet process but not for zinc-blende GaN in the metallic regime.

  5. Growth of semipolar (1\\bar{1}01) high-indium-content InGaN quantum wells using InGaN tilting layer on Si(001)

    NASA Astrophysics Data System (ADS)

    Kushimoto, Maki; Honda, Yoshio; Amano, Hiroshi

    2016-05-01

    Low-toxity high-In-content InGaN is an attractive option for short-distance communications through plastic optical fibers because its performance is only slightly affected by temperature. However, its fabrication on the c-plane is impaired by In droplets and V pits, which form at low-growth temperature. On the other hand, unlike the c-plane, (1\\bar{1}01) InGaN relaxes with tilting. Therefore, in this study, we first grew a high-In-content InGaN single layer, and then we fabricated an InGaN tilting layer between (1\\bar{1}01) InGaN-based multiple quantum wells (MQWs) and GaN stripes/(001)Si. The emission wavelength increased with the InGaN tilting layer’s growth time because the strain was relaxed by misfit dislocations at the heterointerface. This layer also extended the emission peak of InGaN/GaN MQWs and increased the photoluminescence intensity with respect to that of a single-layered InGaN. Therefore, the InGaN tilting layer is effective for growing high-In-content (1\\bar{1}01) InGaN MQWs.

  6. A New Method to Modify Two-Dimensional Electron Gas Density by GaN Cap Etching

    NASA Astrophysics Data System (ADS)

    Li, Zhongda; Chow, T. Paul

    2013-08-01

    We have experimentally demonstrated a new method for modifying the two-dimensional electron density (2DEG) at the AlGaN/GaN interface by etching of the GaN cap layer on top of the AlGaN. GaN MOS capacitors have been fabricated on samples with partially or fully etched GaN cap, and the 2DEG density has been extracted. The results show a linear relation between the 2DEG density and the thickness of the GaN cap being etched. We have also fabricated van der Pauw structures and obtained the 2DEG density using Hall measurements, and the results are consistent with that from the GaN MOS capacitors.

  7. Ion-implanted GaN junction field effect transistor

    SciTech Connect

    Zolper, J.C.; Shul, R.J.; Baca, A.G.; Wilson, R.G.; Pearton, S.J.; Stall, R.A.

    1996-04-01

    Selective area ion implantation doping has been used to fabricate GaN junction field effect transistors (JFETs). {ital p}-type and {ital n}-type doping was achieved with Ca and Si implantation, respectively, followed by a 1150{degree}C rapid thermal anneal. A refractory W gate contact was employed that allows the {ital p}-gate region to be self-aligned to the gate contact. A gate turn-on voltage of 1.84 V at 1 mA/mm of gate current was achieved. For a {approximately}1.7 {mu}m{times}50 {mu}m JFET with a {minus}6 V threshold voltage, a maximum transconductance of 7 mS/mm at {ital V}{sub GS}={minus} 2V and saturation current of 33 mA/mm at {ital V}{sub GS}=0 V were measured. These results were limited by excess access resistance and can be expected to be improved with optimized {ital n}{sup +} implants in the source and drain regions. {copyright} {ital 1996 American Institute of Physics.}

  8. Dopant distribution in high fluence Fe implanted GaN

    SciTech Connect

    Azarov, A. Yu.; Jensen, J.; Hallen, A.; Aggerstam, T.

    2008-09-01

    Undoped wurtzite GaN epilayers implanted at room temperature with 50-325 keV Fe{sup +} ions in the fluence range of 10{sup 15}-10{sup 17} ions/cm{sup 2} are studied by a combination of Rutherford backscattering/channeling spectrometry and time-of-flight elastic recoil detection analysis. The results show an enhanced Fe concentration close to the surface for high ion fluences (>1x10{sup 16} cm{sup -2}), which increases with the ion fluence. Annealing at 800 deg. C for 30 min has a negligible effect on the Fe distribution in the material bulk, but further increases the Fe concentration near the surface. Our findings can be understood by radiation enhanced diffusion during ion implantation and an increased Fe diffusivity in the near surface region with distorted stoichiometry, or formation of secondary phases and precipitates for the highest doses. The simulation shows that, if enhanced diffusion is the reason for Fe buildup at the surface, both radiation enhanced diffusion and the thermal diffusion of Fe atoms near the surface, need to be at least five times larger than ordinary bulk diffusion to explain the increased Fe surface concentration.

  9. Photoionization Spectroscopy of Trapping Centers in GaN FETs

    NASA Astrophysics Data System (ADS)

    Klein Freitas, P. B., Jr.; Binari, S. C.; Wickenden, A. E.

    2000-03-01

    Measurements of the spectral and intensity dependences of the optically-induced reversal of current collapse in a GaN metal semiconductor field effect transistor (MESFET) have been compared to the results of modeling the phenomenon assuming a net transfer of charge from the conducting channel to the high-resistivity (HR) region of the device. The reversal was assumed to result from the photoionization of trapped carriers that return to the channel under the influence of a large built-in field at the channel/HR-substrate interface. For a MESFET in which two distinct trapping centers have been spectrally resolved, the experimentally measured dependence upon light intensity was fitted using this model. The two traps were found to have very different photoionization cross-sections (6x10-17 cm^2 and 2.4x10-15cm^2) but comparable concentrations (3x10^11cm-2 and 7x10^11cm-2), suggesting that both traps contribute comparably to the observed current collapse.

  10. Effects of Hydrogen Implantation into GaN

    SciTech Connect

    Abernathy, C.R.; Han, J.; Pearton, S.J.; Shul, R.J.; Song, C.Y.; Stavola, M.; Weinstein, M.G.; Wilson, R.G.; Zavada, J.M.

    1998-12-24

    Proton implantation in GaN is found to reduce the free carrier density through two mechanisms - first, by creating electron and hole traps at around Ec-0.8eV and Ev+0.9eV that lead to compensation in both n- and p-type material, and second, by leading to formation of (AH)O complexes, where A is any acceptor (Mg, Ca, Zn, Be, Cd). The former mechanism is usefid in creating high resistivity regions for device isolation, whereas the latter produces unintentional acceptor passivation that is detrimental to device performance. The strong affinity of hydrogen for acceptors leads to markedly different redistribution behavior for implanted in n- and p-GaN due to the chemical reaction to form neutral complexes in the latter. The acceptors may be reactivated by simple annealing at 2600{degrees}C, or by electron injection at 25-150{degrees}C that produces debonding of the (AH) centers. Implanted hydrogen is also strongly attracted to regions of strain in heterostructure samples during annealing, leading to pile-up at epi-epi and epi-substrate interfaces. II? spectroscopy shows that implanted hydrogen also decorates VG, defects in undoped and n-GaN.

  11. Temperature Dependence of the Free Excitons in GaN

    NASA Astrophysics Data System (ADS)

    Reynolds, D. C.; Collins, T. C.

    2002-03-01

    We are presenting the temperature dependence of the photoluminescence (PL) of the free excitons and donor bound exciton ( D^circ ,X) in GaN. The excitons involved are the longitudinal, the Γ5 and the Γ6 excitons as well as D^circ ,X. The temperature dependence of the energy positions of Γ_5, Γ_6, and D^circ ,X are well mapped out using the Varshni equation in a temperature range of 0 -- 60 K. In this temperature range, the energy positions of the longitudinal excitons depart from the predictions of the Varshni equation used for the other excitons. If more than one columnar structural direction is present, then in PL, more than one longitudinal mode might be observed. The sample being investigated shows two longitudinal modes. The energy separation between the longitudinal and transverse modes has been reported by Hopfield and Thomas. One component in the separation is the polarizability, which has some temperature dependence. The longitudinal exciton then has a band gap temperature dependence, which is predicted by the Varshni equation and an additional temperature dependence due to the polarizability. We have used the Varshni equation plus a linear and quadratic temperature dependence term to map the energy positions of the longitudinal excitons.

  12. Thick (>20 µm) and high-resistivity carbon-doped GaN-buffer layers grown by metalorganic vapor phase epitaxy on n-type GaN substrates

    NASA Astrophysics Data System (ADS)

    Tsuchiya, Tomonobu; Terano, Akihisa; Mochizuki, Kazuhiro

    2016-05-01

    To improve the performance of GaN power devices, we have investigated the crystalline quality of thick (>20 µm) carbon-doped GaN layers on n-type GaN substrates and templates. The surface morphologies and X-ray rocking curves of carbon-doped GaN layers were improved by using GaN substrates. However, the crystalline quality degraded when the carbon concentration was too high (1 × 1020 cm‑3), even in the case of GaN substrates. High breakdown voltages (approximately 7 kV under a lateral configuration) were obtained for the carbon-doped GaN layers on n-type GaN substrates when the carbon concentration was 5 × 1019 cm‑3. These results indicate that lateral power devices with high breakdown voltage can be fabricated by using thick carbon-doped GaN buffer layers, even on n-type GaN substrates.

  13. Valence band offset of β-Ga2O3/wurtzite GaN heterostructure measured by X-ray photoelectron spectroscopy

    PubMed Central

    2012-01-01

    A sample of the β-Ga2O3/wurtzite GaN heterostructure has been grown by dry thermal oxidation of GaN on a sapphire substrate. X-ray diffraction measurements show that the β-Ga2O3 layer was formed epitaxially on GaN. The valence band offset of the β-Ga2O3/wurtzite GaN heterostructure is measured by X-ray photoelectron spectroscopy. It is demonstrated that the valence band of the β-Ga2O3/GaN structure is 1.40 ± 0.08 eV. PMID:23046910

  14. Lattice-matched HfN buffer layers for epitaxy of GaN on Si

    SciTech Connect

    Armitage, Robert; Yang, Qing; Feick, Henning; Gebauer, Joerg; Weber, Eicke R.; Shinkai, Satoko; Sasaki, Katsutaka

    2002-05-08

    Gallium nitride is grown by plasma-assisted molecular-beam epitaxy on (111) and (001) silicon substrates using sputter-deposited hafnium nitride buffer layers. Wurtzite GaN epitaxial layers are obtained on both the (111) and (001) HfN/Si surfaces, with crack-free thickness up to 1.2 (mu)m. Initial results for GaN grown on the (111) surface show a photoluminescence peak width of 17 meV at 11 K, and an asymmetric x-ray rocking curve width of 20 arcmin. Wurtzite GaN on HfN/Si(001) shows reduced structural quality and peculiar low-temperature luminescence features. However, growth on the (001) surface results in nearly stress-free films, suggesting that much thicker crack-free layers could be obtained.

  15. Microstructure of GaN epitaxy on SiC using AlN buffer layers

    SciTech Connect

    Ponce, F.A.; Krusor, B.S.; Major, J.S. Jr.; Plano, W.E.; Welch, D.F.

    1995-07-17

    The crystalline structure of GaN epilayers on (0001) SiC substrates has been studied using x-ray diffraction and transmission microscopy. The films were grown by metalorganic chemical vapor deposition, using AlN buffer layers. X-ray diffraction measurements show negligible strain in the epilayer, and a long-range variation in orientation. Transmission electron lattice images show that the AlN buffer layer consists of small crystallites. The nature of the buffer layer and its interfaces with the substrate and the GaN film is discussed. The defect structure of the GaN film away from the substrate consists mostly of threading dislocations with a density of {similar_to}10{sup 9} cm{sup {minus}2}. {copyright} {ital 1995} {ital American} {ital Institute} {ital of} {ital Physics}.

  16. OMVPE growth of P-type GaN using solution Cp2Mg

    NASA Astrophysics Data System (ADS)

    Qi, Yundong; Musante, Charles; Lau, Kei May; Smith, Lesley; Odedra, Rajesh; Kanjolia, Ravi

    2001-11-01

    Bis(cyclopentadienyl)magnesium (Cp2Mg) is a common source for p-type doping in GaN and AlInGaP materials. It is a white crystalline solid with very low vapor pressure, leading to transport problems similar to solid trimethyindium (TMI). Some of these problems can be alleviated by a newly developed source-solution magnesocene, Cp2Mg, dissolved in a solvent that is essentially nonvolatile. In this paper, we report the growth and comparative results of Mg-doped GaN grown by OMVPE using solid and solution Cp2Mg. Using both sources, we optimized parameters to obtain high-quality GaN growth with hole concentrations up to 1 1018/cm3.

  17. Prostate specific antigen detection using AlGaN /GaN high electron mobility transistors

    NASA Astrophysics Data System (ADS)

    Kang, B. S.; Wang, H. T.; Lele, T. P.; Tseng, Y.; Ren, F.; Pearton, S. J.; Johnson, J. W.; Rajagopal, P.; Roberts, J. C.; Piner, E. L.; Linthicum, K. J.

    2007-09-01

    Antibody-functionalized Au-gated AlGaN /GaN high electron mobility transistors (HEMTs) were used to detect prostate specific antigen (PSA). The PSA antibody was anchored to the gate area through the formation of carboxylate succinimdyl ester bonds with immobilized thioglycolic acid. The AlGaN /GaN HEMT drain-source current showed a rapid response of less than 5s when target PSA in a buffer at clinical concentrations was added to the antibody-immobilized surface. The authors could detect a wide range of concentrations from 10pg/mlto1μg/ml. The lowest detectable concentration was two orders of magnitude lower than the cutoff value of PSA measurements for clinical detection of prostate cancer. These results clearly demonstrate the promise of portable electronic biological sensors based on AlGaN /GaN HEMTs for PSA screening.

  18. Simulation analysis of GaN microdomes with broadband omnidirectional antireflection for concentrator photovoltaics

    NASA Astrophysics Data System (ADS)

    Han, Lu; Zhao, Hongping

    2014-04-01

    Microdome structures are analyzed as surface topology to reduce surface reflection over a broad spectral range and wide light incidence angle for concentrator photovoltaics application. Three dimensional finite difference time domain method was used to accurately calculate the surface reflection and transmission for surface topologies with different feature sizes and aspect ratios. Studies show that the use of GaN microdomes will lead to a significant reduction of the surface reflection over a broad wavelength range and wide incidence angle range. The surface reflection significantly depends on the surface structure feature size and geometrical shape. The design of the GaN microdomes provides flexibility to tune the structure in order to obtain the minimum surface reflection for different designs of concentrator optical systems. The surface reflections of the GaN microdomes are compared with that of the conventional flat surface as well as the one with antireflection coating.

  19. Effect of diffusion from a lateral surface on the rate of GaN nanowire growth

    SciTech Connect

    Sibirev, N. V. Tchernycheva, M.; Cirlin, G. E.; Patriarche, G.; Harmand, J. C.; Dubrovskii, V. G.

    2012-06-15

    The kinetics of the growth of GaN crystalline nanowires on a Si (111) surface with no catalyst is studied experimentally and theoretically. Noncatalytic GaN nanowires were grown by molecular-beam epitaxy with AlN inserts, which makes it possible to determine the rate of the vertical growth of nanowires. A model for the formation of GaN nanowires is developed, and an expression for their rate of growth is derived. It is shown that, in the general case, the dependence of the rate of growth on the nanowire diameter has a minimum. The diameter corresponding to the experimentally observed minimum of the rate of growth steadily increases with increasing diffusion flux from the lateral surface.

  20. Structural and magnetic impact of Cr+-implantation into GaN thin film

    NASA Astrophysics Data System (ADS)

    Husnain, G.; Shu-De, Yao; Ahmad, Ishaq; Rafique, H. M.

    2012-06-01

    Thin films of GaN with thickness of 2 μm were synthesized on sapphire. Cr+ ions were implanted into GaN with150 keV energy at a fluence of 3 × 1015 cm-2. The annealing of the samples was carried out for a short time using rapid thermal annealing (RTA). Structural properties of the implanted samples were undertaken by XRD and Rutherford backscattering. The annealed samples demonstrated lattice recovery and damages caused by implantation. The structural properties were also studied by High-resolution X-ray Diffraction (HRXRD). Magnetic measurements of the samples were performed by Alternating Gradient Magnetometer (AGM) at room temperature and by SQUID in the range of 5-380 K. The SQUID results showed ferromagnetic behavior at T = 5 K and above 380 K for Cr+-implanted GaN.

  1. Effect of light Si doping on the properties of GaN

    NASA Astrophysics Data System (ADS)

    Shang, Lin; Zhai, Guangmei; Jia, Zhigang; Mei, Fuhong; Lu, Taiping; Liu, Xuguang; Xu, Bingshe

    2016-03-01

    An obvious increase in electron mobility and yellow luminescence (YL) band intensity was found in light Si doping GaN. For a series of GaN samples with different doping concentration, the dislocation density is almost the same. It is inferred that the abrupt increase in mobility and YL intensity does not originate from the change of dislocation density. The mobility behavior is attributed to the screening of scattering by dislocation and increase of ionized impurity scattering with the increase of Si doping concentration. At lower doping level, the screening of dislocation scattering is dominant, which results in the increase in carrier mobility. At higher doping level, the increase in ionized impurity scattering leads to the decrease in carrier mobility. Higher mobility causes longer diffusion length of nonequilibrium carrier. More dislocations will participate in the recombination process which induces stronger YL intensity in light Si doping GaN.

  2. Synthesis, morphology and optical properties of GaN and AlGaN semiconductor nanostructures

    SciTech Connect

    Kuppulingam, B. Singh, Shubra Baskar, K.

    2014-04-24

    Hexagonal Gallium Nitride (GaN) and Aluminum Gallium Nitride (AlGaN) nanoparticles were synthesized by sol-gel method using Ethylene Diamine Tetra Acetic acid (EDTA) complex route. Powder X-ray diffraction (PXRD) analysis confirms the hexagonal wurtzite structure of GaN and Al{sub 0.25}Ga{sub 0.75}N nanoparticles. Surface morphology and elemental analysis were carried out by Scanning Electron Microscope (SEM) and Energy Dispersive X-ray spectroscopy (EDX). The room temperature Photoluminescence (PL) study shows the near band edge emission for GaN at 3.35 eV and at 3.59 eV for AlGaN nanoparticles. The Aluminum (Al) composition of 20% has been obtained from PL emission around 345 nm.

  3. Measurement of the electrostatic edge effect in wurtzite GaN nanowires

    SciTech Connect

    Henning, Alex; Rosenwaks, Yossi; Klein, Benjamin; Bertness, Kris A.; Blanchard, Paul T.; Sanford, Norman A.

    2014-11-24

    The electrostatic effect of the hexagonal corner on the electronic structure in wurtzite GaN nanowires (NWs) was directly measured using Kelvin probe force microscopy (KPFM). By correlating electrostatic simulations with the measured potential difference between the nanowire face and the hexagonal vertices, the surface state concentration and band bending of GaN NWs were estimated. The surface band bending is important for an efficient design of high electron mobility transistors and for opto-electronic devices based on GaN NWs. This methodology provides a way to extract NW parameters without making assumptions concerning the electron affinity. We are taking advantage of electrostatic modeling and the high precision that KPFM offers to circumvent a major source of uncertainty in determining the surface band bending.

  4. Coaxial metal-oxide-semiconductor (MOS) Au/Ga2O3/GaN nanowires.

    PubMed

    Hsieh, Chin-Hua; Chang, Mu-Tung; Chien, Yu-Jen; Chou, Li-Jen; Chen, Lih-Juann; Chen, Chii-Dong

    2008-10-01

    Coaxial metal-oxide-semiconductor (MOS) Au-Ga2O3-GaN heterostructure nanowires were successfully fabricated by an in situ two-step process. The Au-Ga2O3 core-shell nanowires were first synthesized by the reaction of Ga powder, a mediated Au thin layer, and a SiO2 substrate at 800 degrees C. Subsequently, these core-shell nanowires were nitridized in ambient ammonia to form a GaN coating layer at 600 degrees C. The GaN shell is a single crystal, an atomic flat interface between the oxide and semiconductor that ensures that the high quality of the MOS device is achieved. These novel 1D nitride-based MOS nanowires may have promise as building blocks to the future nitride-based vertical nanodevices. PMID:18778107

  5. Analysis and modelling of GaN Schottky-based circuits at millimeter wavelengths

    NASA Astrophysics Data System (ADS)

    Pardo, D.; Grajal, J.

    2015-11-01

    This work presents an analysis of the capabilities of GaN Schottky diodes for frequency multipliers and mixers at millimeter wavelengths. By using a Monte Carlo (MC) model of the diode coupled to a harmonic balance technique, the electrical and noise performances of these circuits are investigated. Despite the lower electron mobility of GaN compared to GaAs, multipliers based on GaN Schottky diodes can be competitive in the first stages of multiplier chains, due to the excellent power handling capabilities of this material. The performance of these circuits can be improved by taking advantage of the lateral Schottky diode structures based on AlGaN/GaN HEMT technology.

  6. Dislocation structures and mobilities in GaN from molecular dynamics simulations

    NASA Astrophysics Data System (ADS)

    Weingarten, N.

    2013-03-01

    The deleterious electronic effects associated with the presence of misfit and threading dislocations have been a major problem hindering application of wide bandgap wurtzite semiconductors such as GaN. Due to the many possible mechanisms that contribute to dislocation formation, systematic approaches for their elimination have remained elusive. Phenomena related to dislocation glide and entanglement can be investigated using discrete dislocation dynamics simulations, however accurate mobility laws must first be determined. In this work, results are presented from molecular dynamics simulations performed to calculate dislocation velocities in GaN as a function of applied stress and temperature. The structure of dislocation cores for a number of slip systems is presented, and comparisons are made between dislocations in the basal, prismatic, and pyramidal planes. The mechanisms driving dislocation motion are presented for various slip systems, as well as for both edge and screw dislocations. Finally, we discuss the development of mobility laws for GaN based on our atomistic results.

  7. A high efficiency C-band internally-matched harmonic tuning GaN power amplifier

    NASA Astrophysics Data System (ADS)

    Lu, Y.; Zhao, B. C.; Zheng, J. X.; Zhang, H. S.; Zheng, X. F.; Ma, X. H.; Hao, Y.; Ma, P. J.

    2016-09-01

    In this paper, a high efficiency C-band gallium nitride (GaN) internally-matched power amplifier (PA) is presented. This amplifier consists of 2-chips of self-developed GaN high-electron mobility transistors (HEMTs) with 16 mm total gate width on SiC substrate. New harmonic manipulation circuits are induced both in the input and output matching networks for high efficiency matching at fundamental and 2nd-harmonic frequency, respectively. The developed amplifier has achieved 72.1% power added efficiency (PAE) with 107.4 W output power at 5 GHz. To the best of our knowledge, this amplifier exhibits the highest PAE in C-band GaN HEMT amplifiers with over 100 W output power. Additionally, 1000 hours' aging test reveals high reliability for practical applications.

  8. Schottky barrier formation at the Au to rare earth doped GaN thin film interface

    NASA Astrophysics Data System (ADS)

    McHale, S. R.; McClory, J. W.; Petrosky, J. C.; Wu, J.; Rivera, A.; Palai, R.; Losovyj, Ya. B.; Dowben, P. A.

    2011-09-01

    The Schottky barriers formed at the interface between gold and various rare earth doped GaN thin films (RE = Yb, Er, Gd) were investigated in situ using synchrotron photoemission spectroscopy. The resultant Schottky barrier heights were measured as 1.68 ± 0.1 eV (Yb:GaN), 1.64 ± 0.1 eV (Er:GaN), and 1.33 ± 0.1 eV (Gd:GaN). We find compelling evidence that thin layers of gold do not wet and uniformly cover the GaN surface, even with rare earth doping of the GaN. Furthermore, the trend of the Schottky barrier heights follows the trend of the rare earth metal work function.

  9. Lithographically defined carbon growth templates for ELOG of GaN

    NASA Astrophysics Data System (ADS)

    Burckel, D. B.; Fan, Hongyou; Thaler, G.; Koleske, D. D.

    2008-06-01

    We report the initial use of lithographically defined carbon growth templates for use as an epitaxial lateral overgrowth (ELOG) mask for metalorganic chemical vapor deposition (MOCVD) heteroepitaxial GaN on sapphire. Interferometric lithography is used to define high aspect ratio structures in SU-8, which are then pyrolyzed in a reducing atmosphere up to 1200 °C. The resist structures convert to amorphous carbon, shrinking 80% in the vertical direction and 53% in the horizontal direction, but maintain their pattern geometry and adhesion to the substrate. These templates are capable of surviving GaN nucleation layer growth temperatures (˜530 °C), GaN crystal growth and high-temperature annealing up to 1050 °C. This new approach to ELOG offers several advantages, requiring fewer processing steps, and favorable selectivity tendencies as well as the capability to create growth masks which are difficult or impossible to fabricate using a top-down etching approach.

  10. Global analysis of GaN growth using a solution technique

    NASA Astrophysics Data System (ADS)

    Kashiwagi, D.; Gejo, R.; Kangawa, Y.; Liu, L.; Kawamura, F.; Mori, Y.; Sasaki, T.; Kakimoto, K.

    2008-04-01

    The solution growth technique is one of the key methods for fabricating gallium nitride (GaN) wafers with small dislocation density. Since the growth rate of GaN using the solution technique is small, the key issue of the technique is to enhance the growth rate of the crystal. We studied how nitrogen is transferred from the surface of the flux to the interface between the top of the flux and the crystal in a muffle furnace using a global model that includes radiative, convective and conductive heat and mass transfer, including nitrogen transfer. The average growth rate of GaN increased when the temperature difference between the furnace wall and a crucible wall became large. This phenomenon is based on mixing of the flux due to natural convection.

  11. Effect of Capping on Electrical and Optical Properties of GaN Layers Grown by HVPE

    NASA Astrophysics Data System (ADS)

    Reshchikov, M. A.; Usikov, A.; Helava, H.; Makarov, Yu.; Puzyk, M. V.; Papchenko, B. P.

    2016-04-01

    Gallium nitride, grown by hydride vapor phase epitaxy and capped with a thin AlGaN layer, was studied by photoluminescence (PL) methods. The concentration of free electrons in GaN was found from the time-resolved PL data, and the concentrations of point defects were estimated from the steady-state PL measurements. The intensity of PL from GaN decreases moderately after capping it with Si-doped AlGaN, and it decreases dramatically after capping with Mg-doped AlGaN. At the same time, the concentration of free electrons and the concentrations of main radiative defects in GaN are not affected by the AlGaN capping. We demonstrate that PL is a powerful tool for nondestructive characterization of semiconductor layers buried under overlying device structures.

  12. Cubic and hexagonal GaN nanoparticles synthesized at low temperature

    NASA Astrophysics Data System (ADS)

    Qaeed, M. A.; Ibrahim, K.; Saron, K. M. A.; Salhin, A.

    2013-12-01

    This study involves a simple and low cost chemical method for the synthesis of Gallium Nitride (GaN) nanoparticles at low temperature. Structural and optical characterizations were carried out using various techniques in order to investigate the properties of the nanoparticles. The Field-Emission Scanning Electron Microscope (FESEM) images showed that the nanoparticles consist of cubic and hexagonal shapes, indicating crystallized structural quality of the GaN nanoparticles. The average size of the nanoparticles was found to be 51 nm. The X-ray Diffraction (XRD) and Raman analysis further confirmed the hexagonal and cubic phases of GaN nanoparticles. The room temperature photoluminescence deduced h-GaN energy gaps of 2.95, 3.12 and 3.13 eV.

  13. Large photocurrents in GaN porous structures with a redshift of the photoabsorption edge

    NASA Astrophysics Data System (ADS)

    Sato, Taketomo; Kumazaki, Yusuke; Kida, Hirofumi; Watanabe, Akio; Yatabe, Zenji; Matsuda, Soichiro

    2016-01-01

    Photoresponse and photoabsorption properties of GaN porous structures were investigated by measuring photocurrent and spectroscopic photoabsorption under monochromatic light with various wavelengths. The measured photocurrents on the porous GaN electrodes were larger than those on the planar electrodes due to the unique features of the former electrode, such as large surface area and low photoreflectance properties. Moreover, the photocurrents were observed even under illumination with wavelength of 380 nm, corresponding to photon energy of 3.26 eV, which is 130 meV lower than the bandgap energy of bulk GaN. A potential simulation revealed that a high-electric field was induced at the pore tips due to modification of the potential in the porous structures. The observed redshift of the photoabsorption edge can be qualitatively explained by the Franz-Keldysh effect.

  14. Formation of GaN porous structures with improved structural controllability by photoassisted electrochemical etching

    NASA Astrophysics Data System (ADS)

    Kumazaki, Yusuke; Yatabe, Zenji; Sato, Taketomo

    2016-04-01

    We aimed to develop a photoassisted electrochemical etching process for the formation of GaN porous structures. Pore linearity and depth controllability were strongly affected by the anode voltage. In addition, the use of light with an energy below the band gap played an important role in controlling the pore diameter. Spectro-electrochemical measurements revealed that the high electric field induced at the GaN/electrolyte interface caused a redshift of the photoabsorption edge. This specific phenomenon can be explained by a theoretical calculation based on the Franz-Keldysh effect. On the basis of the results of our experimental and theoretical analyze, we propose a formation model for GaN porous structures. We also note that the application of the Franz-Keldysh effect is useful in controlling the structural properties of GaN porous structures.

  15. Optical properties of wurtzite/zinc-blende heterostructures in GaN nanowires

    NASA Astrophysics Data System (ADS)

    Jacopin, G.; Rigutti, L.; Largeau, L.; Fortuna, F.; Furtmayr, F.; Julien, F. H.; Eickhoff, M.; Tchernycheva, M.

    2011-09-01

    The optical and structural properties of wurtzite GaN nanowires containing zinc-blende GaN inclusions of different thicknesses are investigated. Micro-photoluminescence spectra of single nanowires exhibit a series of narrow emission peaks with linewidth as low as 0.8 meV in the interval 3.1-3.42 eV. The peak energy blue-shifts with increasing excitation power following a ˜I1/3 law due to the progressive band filling and to the screening of the internal field. The quantum confinement in these type-II crystal phase heterostructures was simulated in the framework of a one-dimensional effective mass model, accounting for the internal electrical polarization of the wurtzite GaN. The predicted transition energies are in good agreement with the energy statistics realized on more than 30 single nanowire emission spectra.

  16. Preparation and properties of inverse perovskite Mn3GaN thin films and heterostructures

    NASA Astrophysics Data System (ADS)

    Tashiro, H.; Suzuki, R.; Miyawaki, T.; Ueda, K.; Asano, H.

    2013-08-01

    Thin films and heterostructures of Mn3GaN with an inverse perovskite structure were grown epitaxially on SrTiO3 (001) and (La0.18Sr0.82)(Al0.59Ta0.41)O3 (001) (LSAT) substrates by ion beam sputtering, and their structural and electrical properties have been investigated. Mn3GaN epitaxial thin films showed metallic behavior of temperature-dependent resistivity with a small maximum at 290-340 K. The maximum resistivity could be attributed to the magnetic transition from antiferromagnetism to paramagnetism. It has been found that epitaxial heterostructures formed by ferroelectric Ba0.7Sr0.3TiO3 and Mn3GaN layers exhibit a large magnetocapacitance effect of more than 2000% in an applied magnetic filed of 1.5 T.

  17. A low cost, green method to synthesize GaN nanowires

    PubMed Central

    Zhao, Jun-Wei; Zhang, Yue-Fei; Li, Yong-He; Su, Chao-hua; Song, Xue-Mei; Yan, Hui; Wang, Ru-Zhi

    2015-01-01

    The synthesis of gallium nitride nanowires (GaN NWs) by plasma enhanced chemical vapor deposition (PECVD) are successfully demonstrated in this work. The simple and green synthesis route is to introduce gallium oxide (Ga2O3) and nitrogen (N2) for the growth of nanowires. The prepared GaN nanowires have a single crystalline wurtzite structure, which the length of some nanowires is up to 20 μm, with a maximum diameter about 140 nm. The morphology and quantity of the nanowires can be modulated by the growth substrate and process parameters. In addition, the photoluminescence and field emission properties of the prepared GaN nanowires have been investigated, which were found to be largely affected by their structures. This work renders an environmentally benign strategy and a facile approach for controllable structures on nanodevice. PMID:26643613

  18. Room-Temperature Transport of Indirect Excitons in (Al ,Ga )N /GaN Quantum Wells

    NASA Astrophysics Data System (ADS)

    Fedichkin, F.; Guillet, T.; Valvin, P.; Jouault, B.; Brimont, C.; Bretagnon, T.; Lahourcade, L.; Grandjean, N.; Lefebvre, P.; Vladimirova, M.

    2016-07-01

    We report on the exciton propagation in polar (Al ,Ga )N /GaN quantum wells over several micrometers and up to room temperature. The key ingredient to achieve this result is the crystalline quality of GaN quantum wells grown on GaN substrate that limits nonradiative recombination. From the comparison of the spatial and temporal dynamics of photoluminescence, we conclude that the propagation of excitons under continuous-wave excitation is assisted by efficient screening of the in-plane disorder. Modeling within drift-diffusion formalism corroborates this conclusion and suggests that exciton propagation is still limited by the exciton scattering on defects rather than by exciton-exciton scattering so that improving interface quality can boost exciton transport further. Our results pave the way towards room-temperature excitonic devices based on gate-controlled exciton transport in wide-band-gap polar heterostructures.

  19. Photoinduced conversion of methane into benzene over GaN nanowires.

    PubMed

    Li, Lu; Fan, Shizhao; Mu, Xiaoyue; Mi, Zetian; Li, Chao-Jun

    2014-06-01

    As a class of key building blocks in the chemical industry, aromatic compounds are mainly derived from the catalytic reforming of petroleum-based long chain hydrocarbons. The dehydroaromatization of methane can also be achieved by using zeolitic catalysts under relatively high temperature. Herein we demonstrate that Si-doped GaN nanowires (NWs) with a 97% rationally constructed m-plane can directly convert methane into benzene and molecular hydrogen under ultraviolet (UV) illumination at rt. Mechanistic studies suggest that the exposed m-plane of GaN exhibited particularly high activity toward methane C-H bond activation and the quantum efficiency increased linearly as a function of light intensity. The incorporation of a Si-donor or Mg-acceptor dopants into GaN also has a large influence on the photocatalytic performance. PMID:24826797

  20. Long-Lived, Coherent Acoustic Phonon Oscillations in GaN Single Crystals

    SciTech Connect

    Wu, S.; Geiser, P.; Jun, J.; Karpinski, J.; Park, J.-R.; Sobolewski, R.

    2006-01-31

    We report on coherent acoustic phonon (CAP) oscillations studied in high-quality bulk GaN single crystals with a two-color femtosecond optical pump-probe technique. Using a far-above-the-band gap ultraviolet excitation (~270 nm wavelength) and a near-infrared probe beam (~810 nm wavelength), the long-lived, CAP transients were observed within a 10 ns time-delay window between the pump and probe pulses, with a dispersionless (proportional to the probe-beam wave vector) frequency of ~45 GHz. The measured CAP attenuation corresponded directly to the absorption of the probe light in bulk GaN, indicating that the actual (intrinsic) phonon-wave attenuation in our crystals was significantly smaller than the measured 65.8 cm^-1 value. The velocity of the phonon propagation was equal to the velocity of sound in GaN.

  1. Migration mechanisms and diffusion barriers of carbon and native point defects in GaN

    NASA Astrophysics Data System (ADS)

    Kyrtsos, Alexandros; Matsubara, Masahiko; Bellotti, Enrico

    2016-06-01

    Carbon related defects are readily incorporated in GaN due to its abundance during growth both with MBE and MOCVD techniques. Employing first-principles calculations, we compute the migration barriers of carbon interstitials and we discuss possible relevant mechanisms of diffusion in the wurtzite GaN crystal. In addition, we calculate the migration barriers for the diffusion of the native defects of the crystal, i.e., gallium and nitrogen interstitials and vacancies. The minimum energy path and the migration barriers of these defects are obtained using the nudged elastic band method with the climbing image modification. In addition, the dimer method is used to independently determine the results. The results yield a quantitative description of carbon diffusion in GaN allowing for the determination of the most preferable migration paths.

  2. Room temperature epitaxy of Pd films on GaN under conventional vacuum conditions

    NASA Astrophysics Data System (ADS)

    Liu, Q. Z.; Lau, S. S.; Perkins, N. R.; Kuech, T. F.

    1996-09-01

    Pd films deposited at room temperature have been found to grow epitaxially on GaN grown by metalorganic vapor phase epitaxy (MOVPE). The Pd films were deposited on GaN substrates cleaned by chemicals only, and in a conventional e-beam evaporation system with a vacuum of ˜1×10-7 Torr. MeV 4He backscattering spectrometry and the Read x-ray camera were used to evaluate the Pd films. The effects of various chemical etchants—such as aqua regia, HCl:H2O, and HF:H2O—on the epitaxial quality of the Pd films have also been investigated. Ni and Pt films deposited on GaN in a similar manner were also found to be epitaxial.

  3. Self-induced growth of vertical GaN nanowires on silica

    NASA Astrophysics Data System (ADS)

    Kumaresan, V.; Largeau, L.; Oehler, F.; Zhang, H.; Mauguin, O.; Glas, F.; Gogneau, N.; Tchernycheva, M.; Harmand, J.-C.

    2016-04-01

    We study the self-induced growth of GaN nanowires on silica. Although the amorphous structure of this substrate offers no possibility of an epitaxial relationship, the nanowires are remarkably aligned with the substrate normal whereas, as expected, their in-plane orientation is random. Their structural and optical characteristics are compared to those of GaN nanowires grown on standard crystalline Si (111) substrates. The polarity inversion domains are much less frequent, if not totally absent, in the nanowires grown on silica, which we find to be N-polar. This work demonstrates that high-quality vertical GaN nanowires can be elaborated without resorting to bulk crystalline substrates.

  4. Self-induced growth of vertical GaN nanowires on silica.

    PubMed

    Kumaresan, V; Largeau, L; Oehler, F; Zhang, H; Mauguin, O; Glas, F; Gogneau, N; Tchernycheva, M; Harmand, J-C

    2016-04-01

    We study the self-induced growth of GaN nanowires on silica. Although the amorphous structure of this substrate offers no possibility of an epitaxial relationship, the nanowires are remarkably aligned with the substrate normal whereas, as expected, their in-plane orientation is random. Their structural and optical characteristics are compared to those of GaN nanowires grown on standard crystalline Si (111) substrates. The polarity inversion domains are much less frequent, if not totally absent, in the nanowires grown on silica, which we find to be N-polar. This work demonstrates that high-quality vertical GaN nanowires can be elaborated without resorting to bulk crystalline substrates. PMID:26895252

  5. Characterization of vertical GaN p-n diodes and junction field-effect transistors on bulk GaN down to cryogenic temperatures

    NASA Astrophysics Data System (ADS)

    Kizilyalli, I. C.; Aktas, O.

    2015-12-01

    There is great interest in wide-bandgap semiconductor devices and most recently in vertical GaN structures for power electronic applications such as power supplies, solar inverters and motor drives. In this paper the temperature-dependent electrical behavior of vertical GaN p-n diodes and vertical junction field-effect transistors fabricated on bulk GaN substrates of low defect density (104 to 106 cm-2) is described. Homoepitaxial MOCVD growth of GaN on its native substrate and the ability to control the doping in the drift layers in GaN have allowed the realization of vertical device architectures with drift layer thicknesses of 6 to 40 μm and net carrier electron concentrations as low as 1 × 1015 cm-3. This parameter range is suitable for applications requiring breakdown voltages of 1.2 kV to 5 kV. Mg, which is used as a p-type dopant in GaN, is a relatively deep acceptor (E A ≈ 0.18 eV) and susceptible to freeze-out at temperatures below 200 K. The loss of holes in p-GaN has a deleterious effect on p-n junction behavior, p-GaN contacts and channel control in junction field-effect transistors at temperatures below 200 K. Impact ionization-based avalanche breakdown (BV > 1200 V) in GaN p-n junctions is characterized between 77 K and 423 K for the first time. At higher temperatures the p-n junction breakdown voltage improves due to increased phonon scattering. A positive temperature coefficient in the breakdown voltage is demonstrated down to 77 K; however, the device breakdown characteristics are not as abrupt at temperatures below 200 K. On the other hand, contact resistance to p-GaN is reduced dramatically above room temperature, improving the overall device performance in GaN p-n diodes in all cases except where the n-type drift region resistance dominates the total forward resistance. In this case, the electron mobility can be deconvolved and is found to decrease with T -3/2, consistent with a phonon scattering model. Also, normally-on vertical junction

  6. Doping of GaN by ion implantation: Does It Work?

    SciTech Connect

    Suvkhanov, A.; Wu, W.; Price, K.; Parikh, N.; Irene, E.; Hunn, J.; Thomson, D.; Davis, R.F.; Krasnobaev, L.

    1998-04-01

    Epitaxially grown GaN by metal organic chemical vapor deposition (MOCVD) on SiC were implanted with 100 keV Si{sup +} (for n-type) and 80 keV Mg{sup +} (for p-type) with various fluences from 1 {times} 10{sup 12} to 7 {times} 10 {sup 15} ions/cm{sup 2} at liquid nitrogen temperature (LT), room temperature (RT), and 700 C (HT). High temperature (1,200 C and 1,500 C) annealing was carried out after capping the GaN with epitaxial AlN by MOCVD to study damage recovery. Samples were capped by a layer of AlN in order to protect the GaN surface during annealing. Effects of implant temperature, damage and dopant activation are critically studied to evaluate a role of ion implantation in doping of GaN. The damage was studied by Rutherford Backscattering/Channeling, spectroscopic ellipsometry and photoluminescence. Results show dependence of radiation damage level on temperature of the substrate during implantation: implantations at elevated temperatures up to 550 C decrease the lattice disorder; hot implants above 550 C can not be useful in doping of GaN due to nitrogen loss from the surface. SE measurements have indicated very high sensitivity to the implantation damage. PL measurements at LT of 80 keV Mg{sup +} (5 {times} 10{sup 14} cm{sup 2}) implanted and annealed GaN showed two peaks: one {approximately} 100 meV and another {approximately} 140 meV away from the band edge.

  7. Hybrid density functional theory studies of AlN and GaN under uniaxial strain.

    PubMed

    Qin, Lixia; Duan, Yifeng; Shi, Hongliang; Shi, Liwei; Tang, Gang

    2013-01-30

    The structural stability, spontaneous polarization, piezoelectric response, and electronic structure of AlN and GaN under uniaxial strain along the [0001] direction are systematically investigated using HSE06 range-separated hybrid functionals. Our results exhibit interesting behavior. (i) AlN and GaN share the same structural transition from wurtzite to a graphite-like phase at very large compressive strains, similarly to other wurtzite semiconductors. Our calculations further reveal that this well-known phase transition is driven by the transverse-acoustic soft phonon mode associated with elastic instabilities. (ii) The applied tensile strain can either drastically suppress or strongly enhance the polarization and piezoelectricity, based on the value of the strain. Furthermore, large enhancements of polarization and piezoelectricity close to the phase-transition regions at large compressive strains are predicted, similar to those previously predicted in ferroelectric fields. Our calculations indicate that such colossal enhancements are strongly correlated to phase transitions when large atomic displacements are generated by external strains. (iii) Under the same strain, AlN and GaN have significantly different electronic properties: both wurtzite and graphite-like AlN always display direct band structures, while the the bandgap of wurtzite GaN is always direct and that of graphite-like GaN always indirect. Furthermore, the bandgap of graphite-like AlN is greatly enhanced by large compressive strain, but that of wurtzite GaN is not sensitive to compressive strain. Our results are drastically different from those for equibiaxial strain (Duan et al 2012 Appl. Phys. Lett. 100 022104). PMID:23248170

  8. Physical Properties of GaN Nanotubes as Revealed by Computer Simulation

    SciTech Connect

    Wang, Zhiguo; Gao, Fei; Zu, Xiaotao; Weber, William J.

    2008-07-25

    Single-crystalline wurtzite GaN nanotubes have been synthesized recently with proposed applications in nanoscale electronics, optoelectronics and the biochemical-sensing field. Molecular dynamics methods with a Stillinger-Weber potential are used to investigate the melting behavior, thermal conductivity and mechanical properties of these wurtzite-type single crystalline GaN nanotubes. Four major topical areas are summarized in this chapter. (1) The melting temperature of the GaN nanotubes increases with the thickness of the nanotubes to a saturation value, which is close to the melting temperature of bulk GaN. The simulations result reveal that the nanotubes begin to melt at the surface, and then the melting rapidly extends to the interior of the nanotubes as the temperature increases. (2) The thermal conductivity of nanotubes is smaller than that of the bulk GaN single crystal. The thermal conductivity is also found to decrease with temperature and increase with increasing wall thickness of the nanotubes. The change of phonon spectrum and surface inelastic scattering may account for the reduction of thermal conductivity in the nanotubes, while thermal softening and high frequency phonon interactions at high temperatures may provide an explanation for its decrease with increasing temperature. (3) At low temperatures, the simulation results show that the nanotubes exhibit brittle properties; whereas at high temperatures, they behave as ductile materials. The brittle to ductile transition temperature generally increases with increasing wall thickness of the nanotubes and increasing strain rate. (4) The simulation temperature, tube length and strain rate affect the buckling behavior of GaN nanotubes. The critical stress decreases with the increase of simulation temperature and tube length. The dependence of buckling on tube length is consistent with the analysis of equivalent continuum structures using Euler buckling theory.

  9. Realization of compressively strained GaN films grown on Si(110) substrates by inserting a thin AlN/GaN superlattice interlayer

    SciTech Connect

    Shen, X. Q.; Takahashi, T.; Kawashima, H.; Ide, T.; Shimizu, M.

    2012-07-16

    We investigate the strain properties of GaN films grown by plasma-assisted molecular beam epitaxy on Si(110) substrates. It is found that the strain of the GaN film can be converted from a tensile to a compressive state simply by inserting a thin AlN/GaN superlattice structure (SLs) within the GaN film. The GaN layers seperated by the SLs can have different strain states, which indicates that the SLs plays a key role in the strain modulation during the growth and the cooling down processes. Using this simple technique, we grow a crack-free GaN film exceeding 2-{mu}m-thick. The realization of the compressively strained GaN film makes it possible to grow thick GaN films without crack generation on Si substrates for optic and electronic device applications.

  10. Aligned ZnO nanorod arrays growth on GaN QDs for excellent optoelectronic applications

    NASA Astrophysics Data System (ADS)

    Sang, Dandan; Li, Hongdong; Wang, Qinglin

    2016-02-01

    Uniformly aligned ZnO nanorod (NR) arrays grown on GaN quantum dots (QDs) as preferred nucleation sites are imperative for designing field emission emitters, ultraviolet photodetectors and light-emitting diodes for a wide range of new optoelectronic applications. In a recent study (2015 Nanotechnology 26 415601), Qi et al reported a novel method of fabricating ZnO NRs arrays with uniform shape, the density of which is easily tunable by adjusting the density of GaN QDs. This approach opens a door to obtaining a combination of 0D and 1D structures for optoelectronic applications.

  11. Free-Standing GaN Substrates by Hydride Vapor Phase Epitaxy

    NASA Astrophysics Data System (ADS)

    Park, Sung S.; Park, Il-W.; Choh, Sung H.

    2000-11-01

    Thick gallium nitride films 250-350 μm in thickness were grown on 2-inch-diameter (0001) sapphire wafers by hydride vapor phase epitaxy. The size of the free-standing GaN substrates without cracks separated from the sapphire substrates by laser processing was equal to that of the initial sapphire substrates. The origin of bowing and the broad photoluminescence (PL) spectra of GaN films was considered the difference in the residual strain between the front and bottom surfaces caused by threading dislocations.

  12. Time-resolved photoluminescence study of excitons in hexagonal GaN layers grown on sapphire

    NASA Astrophysics Data System (ADS)

    Pau, S.; Liu, Z. X.; Kuhl, J.; Ringling, J.; Grahn, H. T.; Khan, M. A.; Sun, C. J.; Ambacher, O.; Stutzmann, M.

    1998-03-01

    We performed time-resolved and continuous wave photoluminescence on two samples of hexagonal GaN, one with free exciton emission and the other without. For the sample with free exciton emission, very different decay dynamics are observed between the front and backside emission. We find that the strain caused by the lattice mismatch between the sapphire substrate and the GaN film has a large influence on the population decay of the sample with free exciton emission and a minor influence on the decay properties of the sample dominated by bound exciton emission. A polariton picture is used to describe the observed behavior.

  13. Investigation of structural and optical properties of GaN on flat and porous silicon

    NASA Astrophysics Data System (ADS)

    Abud, Saleh H.; Selman, Abbas M.; Hassan, Z.

    2016-09-01

    In this work, gallium nitride (GaN) layers were successfully grown on Flat-Si and porous silicon (PSi) using a radio frequency-magnetron sputtering system. Field emission scanning electron microscopy and atomic force microscopy images showed that the grown film on Flat-Si had smoother surface, even though there were some cracks on it. Furthermore, the X-ray diffraction measurements showed that the peak intensity of all the grown layers on PSi was higher than that of the grown layer on Flat-Si. Our detailed observation showed that PSi is a promising substrate to obtain GaN films.

  14. Thermal Conductivity of GaN Nanotubes Simulated by Nonequilibrium Molecular Dynamics

    SciTech Connect

    Wang, Zhiguo; Gao, Fei; Crocombette, J.-P.; Zu, Xiaotao; Yang, Li; Weber, William J.

    2007-04-15

    Thermal conductivity of GaN nanotubes along the tube axis is investigated over the temperature range of 600K-2300K using homogeneous nonequilibrium molecular dynamics. In general, the thermal conductivity of nanotubes is smaller than that for the bulk GaN single crystal. The thermal conductivity is also found to decrease with temperature and increase with increasing wall thickness of the nanotubes. The change of phonon spectrum and surface inelastic scattering may account for the reduction of thermal conductivity in the nanotubes, while thermal softening and high frequency phonon interactions at high temperatures may provide an explanation for its decrease with increasing temperature.

  15. Microstructural evolution in H ion induced splitting of freestanding GaN

    SciTech Connect

    Moutanabbir, O.; Scholz, R.; Senz, S.; Goesele, U.; Chicoine, M.; Schiettekatte, F.; Suesskraut, F.; Krause-Rehberg, R.

    2008-07-21

    We investigated the microstructural transformations during hydrogen ion-induced splitting of GaN thin layers. Cross-sectional transmission electron microscopy and positron annihilation spectroscopy data show that the implanted region is decorated with a high density of 1-2 nm bubbles resulting from vacancy clustering during implantation. These nanobubbles persist up to 450 deg. C. Ion channeling data show a strong dechanneling enhancement in this temperature range tentatively attributed to strain-induced lattice distortion. The dechanneling level decreases following the formation of plateletlike structures at 475 deg. C. Extended internal surfaces develop around 550 deg. C leading to the exfoliation of GaN thin layer.

  16. Growth of GaN with warm ammonia by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Kawaharazuka, A.; Yoshizaki, T.; Ploog, K. H.; Horikoshi, Y.

    2009-03-01

    We demonstrate the growth of GaN by molecular beam epitaxy with warm ammonia as a nitrogen source. Ammonia gas is heated by the tungsten filament located at the open end of the gas-tube installed in the growth chamber. By using this simple structure, the multiple collisions of molecules within the heater, thus the generation of nitrogen molecule, can be suppressed. The crystalline quality of the grown GaN layer is significantly improved by introducing the warm ammonia. This effect can be explained by the enhancement of the two-dimensional growth due to the active nitrogen species such as radical NH2* generated by cracking ammonia molecule.

  17. Germanium-catalyzed growth of single-crystal GaN nanowires

    NASA Astrophysics Data System (ADS)

    Saleem, Umar; Wang, Hong; Peyrot, David; Olivier, Aurélien; Zhang, Jun; Coquet, Philippe; Ng, Serene Lay Geok

    2016-04-01

    We report the use of Germanium (Ge) as catalyst for Gallium Nitride (GaN) nanowires growth. High-yield growth has been achieved with Ge nanoparticles obtained by dewetting a thin layer of Ge on a Si (100) substrate. The nanowires are long and grow straight with very little curvature. The GaN nanowires are single-crystalline and show a Wurtzite structure growing along the [0001] axis. The growth follows a metal-free Vapor-Liquid-Solid (VLS) mechanism, further allowing a CMOS technology compatibility. The synthesis of nanowires has been done using an industrial Low Pressure Chemical Vapor Deposition (LPCVD) system.

  18. Lattice location of deuterium in plasma and gas charged Mg doped GaN

    SciTech Connect

    Wampler, W.R.; Barbour, J.C.; Seager, C.H.; Myers, S.M. Jr.; Wright, A.F.; Han, J.

    1999-12-02

    The authors have used ion channeling to examine the lattice configuration of deuterium in Mg doped GaN grown by MOCVD. The deuterium is introduced both by exposure to deuterium gas and to ECR plasmas. A density functional approach including lattice relaxation, was used to calculate total energies for various locations and charge states of hydrogen in the wurtzite Mg doped GaN lattice. Computer simulations of channeling yields were used to compare results of channeling measurements with calculated yields for various predicted deuterium lattice configurations.

  19. Ge doped GaN with controllable high carrier concentration for plasmonic applications

    SciTech Connect

    Kirste, Ronny; Hoffmann, Marc P.; Sachet, Edward; Bobea, Milena; Bryan, Zachary; Bryan, Isaac; Maria, Jon-Paul; Collazo, Ramón; Sitar, Zlatko; Nenstiel, Christian; Hoffmann, Axel

    2013-12-09

    Controllable Ge doping in GaN is demonstrated for carrier concentrations of up to 2.4 × 10{sup 20} cm{sup −3}. Low temperature luminescence spectra from the highly doped samples reveal band gap renormalization and band filling (Burstein-Moss shift) in addition to a sharp transition. Infrared ellipsometry spectra demonstrate the existence of electron plasma with an energy around 3500 cm{sup −1} and a surface plasma with an energy around 2000 cm{sup −1}. These findings open possibilities for the application of highly doped GaN for plasmonic devices.

  20. X-ray detectors based on GaN Schottky diodes

    SciTech Connect

    Duboz, Jean-Yves; Frayssinet, Eric; Chenot, Sebastien; Reverchon, Jean-Luc; Idir, Mourad

    2010-10-18

    GaN Schottky diodes have been fabricated and tested as x-ray detectors in the range from 6 to 21 keV. The spectral response has been measured and is compared to its theoretical value. The study of the response and its temporal dynamics as a function of the bias allows to identify a photovoltaic behavior at low bias and a photoconductive one at larger reverse biases. The GaN diode turned out to be linear as a function of the incident power. The noise and detectivity are given and discussed.