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Sample records for 2x nm node

  1. Improving inspectability of sub-2x-nm node masks with complex SRAF

    NASA Astrophysics Data System (ADS)

    Kang, In Yong; Yoon, Gisung; Lee, Jonghee; Chung, Donghoon Paul; Kim, Byung-Gook; Jeon, Chan-Uk; Inderhees, Gregg; Hutchinson, Trent; Cho, Wonil; Hur, Jiuk

    2013-10-01

    As Moore's Law continues its relentless march toward ever smaller geometries on wafer, lithographers who had been relying on the implementation of a solution using EUV lithography are faced with increasing challenges to meet requirements for printing sub-2x nm half-pitch (HP). The available choices rely on 193 nm DUV immersion lithography, but with decreasing k1 values and thus shrinking process windows. To overcome these limitations, two techniques such as inverse lithography technology (ILT) and source mask optimization (SMO) were introduced by computational OPC scheme. From a mask inspection viewpoint, the impact of both ILT and SMO is similar - both result in photomasks that have a large quantity of sub-resolution assist features (SRAFs). These SRAFs are challenging for mask-makers to pattern with high fidelity and accuracy across a full-field mask, and thus mask inspection is challenged to maintain a high sensitivity level on primary mask features while not suffering from a high nuisance detection rate on the SRAF features. To solve this particular issue, new inspection approach was developed by using computational image calibration based wafer scanner simulation. This paper will be described the new capabilities, which analyzes the aerial image to differentiate between printing and non-printing features, and applying the appropriate sensitivity threshold. All analysis will be shown comparing results with and without the new capabilities, with an emphasis on inspectability improvements and nuisance defect reduction to improve mask cycle time.

  2. Manufacturability of 2x-nm devices with EUV tool

    NASA Astrophysics Data System (ADS)

    Tawarayama, Kazuo; Nakajima, Yumi; Kyoh, Suigen; Aoyama, Hajime; Matsunaga, Kentaro; Magoshi, Shunko; Tanaka, Satoshi; Hayashi, Yumi; Mori, Ichiro

    2011-04-01

    Due to the promising development status of EUVL as a practical lithography technology for the 2x-nm node, we are continuing to evaluate its process liability using the EUV1 at Selete, which has an Off-Axis illumination capability. The resolution limit of the EUV1 for L&S patterns is currently 18 nm for dipole illumination, and 16 nm for aggressive dipole illumination. This study examined the critical points of EUVL for device manufacturing through wafer processes. The yield obtained from electrical measurements indicates the maturity of the technology, including the resist process, the tool, and the mask. Optimization of the resist and RIE processes significantly improved the yield. The final yields obtained from electrical measurements were 100% for hp 30 nm, 70% for hp 28 nm, and 40% for hp 26 nm. These results demonstrate EUV lithography to be a practical technology that is now suitable for 2x nm semiconductor manufacture.

  3. Lithography strategy for 65-nm node

    NASA Astrophysics Data System (ADS)

    Borodovsky, Yan A.; Schenker, Richard E.; Allen, Gary A.; Tejnil, Edita; Hwang, David H.; Lo, Fu-Chang; Singh, Vivek K.; Gleason, Robert E.; Brandenburg, Joseph E.; Bigwood, Robert M.

    2002-07-01

    Intel will start high volume manufacturing (HVM) of the 65nm node in 2005. Microprocessor density and performance trends will continue to follow Moore's law and cost-effective patterning solutions capable of supporting it have to be found, demonstrated and developed during 2002-2004. Given the uncertainty regarding the readiness and respective capabilities of 157nm and 193nm lithography to support 65nm technology requirements, Intel is developing both lithographic options and corresponding infrastructure with the intent to use both options in manufacturing. Development and use of dual lithographic options for a given technology node in manufacturing is not a new paradigm for Intel: whenever introduction of a new exposure wavelength presented excessive risk to the manufacturing schedule, Intel developed parallel patterning approaches in time for the manufacturing ramp. Both I-line and 248nm patterning solutions were developed and successfully used in manufacturing of the 350nm node at Intel. Similarly, 248nm and 193nm patterning solutions were fully developed for 130nm node high volume manufacturing.

  4. 32nm node technology development using interference immersion lithography

    NASA Astrophysics Data System (ADS)

    Sewell, Harry; McCafferty, Diane; Markoya, Louis; Hendrickx, Eric; Hermans, Jan; Ronse, Kurt

    2005-05-01

    The 38nm and 32nm lithography nodes are the next major targets for optical lithography on the Semiconductor Industry Roadmap. The recently developed water-based immersion lithography using ArF illumination will be able to provide an optical solution for lithography at the 45nm node, but it will not be able to achieve the 38nm or the 32nm nodes as currently defined. To achieve these next lithographic nodes will require new, very high refractive index fluids to replace the water used in current immersion systems. This paper describes tests and experiments using an interference immersion lithography test jig to develop key technology for the 32nm node. Interference imaging printers have been available for years, and with the advent of Immersion Lithography, they have a new use. Interference immersion image printing offers users a rapid, cost-effective way to develop immersion lithography, particularly at extremely high resolutions. Although it can never replace classical lens-based lithography systems for semiconductor device production, it does offer a way to develop resist and fluid technology at a relatively low cost. Its simple image-forming format offers easy access to the basic physics of advanced imaging. Issues such as: Polarization of the image forming light rays; Fluid/resist interaction during exposure; Topcoat film performance; and the Line Edge Roughness (LER) of resists at extremely high resolutions can all be readily studied. Experiments are described and results are provided for work on: 32nm imaging tests; high refractive index fluid testing using 193nm wavelength at resolutions well beyond current lens-based system capabilities; and polarization configuration testing on 45nm, 38nm, and 32nm L/S features. Results on the performance of resists and topcoats are reported for 32nm L/S features.

  5. Electron beam inspection of 16nm HP node EUV masks

    NASA Astrophysics Data System (ADS)

    Shimomura, Takeya; Narukawa, Shogo; Abe, Tsukasa; Takikawa, Tadahiko; Hayashi, Naoya; Wang, Fei; Ma, Long; Lin, Chia-Wen; Zhao, Yan; Kuan, Chiyan; Jau, Jack

    2012-11-01

    EUV lithography (EUVL) is the most promising solution for 16nm HP node semiconductor device manufacturing and beyond. The fabrication of defect free EUV mask is one of the most challenging roadblocks to insert EUVL into high volume manufacturing (HVM). To fabricate and assure the defect free EUV masks, electron beam inspection (EBI) tool will be likely the necessary tool since optical mask inspection systems using 193nm and 199nm light are reaching a practical resolution limit around 16nm HP node EUV mask. For production use of EBI, several challenges and potential issues are expected. Firstly, required defect detection sensitivity is quite high. According to ITRS roadmap updated in 2011, the smallest defect size needed to detect is about 18nm for 15nm NAND Flash HP node EUV mask. Secondly, small pixel size is likely required to obtain the high sensitivity. Thus, it might damage Ru capped Mo/Si multilayer due to accumulated high density electron beam bombardments. It also has potential of elevation of nuisance defects and reduction of throughput. These challenges must be solved before inserting EBI system into EUV mask HVM line. In this paper, we share our initial inspection results for 16nm HP node EUV mask (64nm HP absorber pattern on the EUV mask) using an EBI system eXplore® 5400 developed by Hermes Microvision, Inc. (HMI). In particularly, defect detection sensitivity, inspectability and damage to EUV mask were assessed. As conclusions, we found that the EBI system has capability to capture 16nm defects on 64nm absorber pattern EUV mask, satisfying the sensitivity requirement of 15nm NAND Flash HP node EUV mask. Furthermore, we confirmed there is no significant damage to susceptible Ru capped Mo/Si multilayer. We also identified that low throughput and high nuisance defect rate are critical challenges needed to address for the 16nm HP node EUV mask inspection. The high nuisance defect rate could be generated by poor LWR and stitching errors during EB writing

  6. Process liability evaluation for beyond 22nm node using EUVL

    NASA Astrophysics Data System (ADS)

    Tawarayama, Kazuo; Aoyama, Hajime; Matsunaga, Kentaro; Arisawa, Yukiyasu; Uno, Taiga; Magoshi, Shunko; Kyoh, Suigen; Nakajima, Yumi; Inanami, Ryoichi; Tanaka, Satoshi; Kobiki, Ayumi; Kikuchi, Yukiko; Kawamura, Daisuke; Takai, Kosuke; Murano, Koji; Hayashi, Yumi; Mori, Ichiro

    2010-04-01

    Extreme ultraviolet lithography (EUVL) is the most promising candidate for the manufacture of devices with a half pitch of 32 nm and beyond. We are now evaluating the process liability of EUVL in view of the current status of lithography technology development. In a previous study, we demonstrated the feasibility of manufacturing 32-nm-node devices by means of a wafer process that employed the EUV1, a full-field step-and-scan exposure tool. To evaluate yield, a test pattern was drawn on a multilayer resist and exposed. After development, the pattern was replicated in SiO2 film by etching, and metal wires were formed by a damascene process. Resolution enhancement is needed to advance to the 22- nm node and beyond, and a practical solution is off-axis illumination (OAI). This paper presents the results of a study on yield improvement that used a 32-nm-node test chip, and also clarifies a critical issue in the use of EUVL in a wafer process for device manufacture at the 22-nm node and beyond.

  7. Photomask technology for 32nm node and beyond

    NASA Astrophysics Data System (ADS)

    Hikichi, Ryugo; Ishii, Hiroyuki; Migita, Hidekazu; Kakehi, Noriko; Shimizu, Mochihiro; Takamizawa, Hideyoshi; Nagano, Tsugumi; Hashimoto, Masahiro; Iwashita, Hiroyuki; Suzuki, Toshiyuki; Hosoya, Morio; Ohkubo, Yasushi; Ushida, Masao; Mitsui, Hideaki

    2008-05-01

    193nm-immersion lithography is the most promising technology for 32nm-node device fabrication. At the 32nm technology-node, the performance of photomasks, not only phase-shift masks but also binary masks, needs to be improved, especially in "resolution" and "CD accuracy". To meet sub-100nm resolution with high precision, further thinning of resist thickness will be needed. To improve CD performance, we have designed a new Cr-on-glass (COG) blank for binary applications, having OD-3 at 193nm. This simple Cr structure can obtain superior performance with the conventional mask-making process. Since the hardmask concept is one of the alternative solutions, we have also designed a multilayered binary blank. The new COG blank (NTARC) was fully dry-etched with over 25% shorter etching time than NTAR7, which is a conventional COG blank. Thinner resist (up to 200nm) was possible for NTARC. NTARC with 200nm-thick resist showed superior resolution and CD linearity in all pattern categories. On the other hand, the multilayered binary stack gives us a wide etching margin for several etching steps. Super thin resist (up to 100nm) was suitable by using a Cr-hardmask on a MoSi-absorber structure (COMS). The COMS blanks showed superior performance, especially in tiny clear patterns, such as the isolated hole pattern. We confirmed that these new photomask blanks, NTARC and COMS, will meet the requirements for 32nm-node and beyond, for all aspects of mask-making.

  8. Double patterning design split implementation and validation for the 32nm node

    NASA Astrophysics Data System (ADS)

    Drapeau, Martin; Wiaux, Vincent; Hendrickx, Eric; Verhaegen, Staf; Machida, Takahiro

    2007-03-01

    Single exposure capable systems for the 32nm 1/2 pitch (HP) node may not be ready in time for production. At the possible NA of 1.35 still using water immersion lithography, one option to generate the required dense pitches is double patterning. Here a design is printed with two separate exposures and etch steps to increase the pitch. If a 2x increase in pitch can be achieved through the design split, double patterning could thus theoretically allow using exposure systems conceived for the 65nm node to print 32nm node designs. In this paper we focus on the aspect of design splitting and lithography for double patterning the poly layer of 32nm logic cells using the Synopsys full-chip physical verification and OPC conversion platforms. All 32nm node cells have been split in an automated fashion to target different aggressiveness towards pitch reduction and polygon cutting. Every design split has gone through lithography optimization, Optical Proximity Correction (OPC) and Lithography Rule Checking (LRC) at NA values of 0.93, 1.20, and 1.35. Final comparisons are based on simulations across the process window. In addition, we have experimentally verified selected single-patterning problem areas on a 1.20 NA exposure tool (ASML XT:1700Fi at IMEC). With this information, we establish guidelines for double patterning conversions and present a new design rule for double patterning compliance checking applicable to full-chip scale.

  9. 28nm node process optimization: a lithography centric view

    NASA Astrophysics Data System (ADS)

    Seltmann, Rolf

    2014-10-01

    Many experts claim that the 28nm technology node will be the most cost effective technology node forever. This results from primarily from the cost of manufacturing due to the fact that 28nm is the last true Single Patterning (SP) node. It is also affected by the dramatic increase of design costs and the limited shrink factor of the next following nodes. Thus, it is assumed that this technology still will be alive still for many years. To be cost competitive, high yields are mandatory. Meanwhile, leading edge foundries have optimized the yield of the 28nm node to such a level that that it is nearly exclusively defined by random defectivity. However, it was a long way to go to come to that level. In my talk I will concentrate on the contribution of lithography to this yield learning curve. I will choose a critical metal patterning application. I will show what was needed to optimize the process window to a level beyond the usual OPC model work that was common on previous nodes. Reducing the process (in particular focus) variability is a complementary need. It will be shown which improvements were needed in tooling, process control and design-mask-wafer interaction to remove all systematic yield detractors. Over the last couple of years new scanner platforms were introduced that were targeted for both better productivity and better parametric performance. But this was not a clear run-path. It needed some extra affords of the tool suppliers together with the Fab to bring the tool variability down to the necessary level. Another important topic to reduce variability is the interaction of wafer none-planarity and lithography optimization. Having an accurate knowledge of within die topography is essential for optimum patterning. By completing both the variability reduction work and the process window enhancement work we were able to transfer the original marginal process budget to a robust positive budget and thus ensuring high yield and low costs.

  10. Wafer topography modeling for ionic implantation mask correction dedicated to 2x nm FDSOI technologies

    NASA Astrophysics Data System (ADS)

    Michel, Jean-Christophe; Le Denmat, Jean-Christophe; Sungauer, Elodie; Robert, Frédéric; Yesilada, Emek; Armeanu, Ana-Maria; Entradas, Jorge; Sturtevant, John L.; Do, Thuy; Granik, Yuri

    2013-04-01

    Reflection by wafer topography and underlying layers during optical lithography can cause unwanted exposure in the resist [1]. This wafer stack effect phenomenon which is neglected for larger nodes than 45nm, is becoming problematic for 32nm technology node and below at the ionic implantation process. This phenomenon is expected to be attenuated by the use of anti-reflecting coating but increases process complexity and adds cost and cycle time penalty. As a consequence, an OPC based solution is today under evaluation to cope with stack effects involved in ionic implantation patterning [2] [3]. For the source drain (SD) ionic implantation process step on 28nm Fully Depleted Silicon-on-Insulator (FDSOI) technology, active silicon areas, poly silicon patterns, Shallow Trench Isolation (STI), Silicon-on-Insulator (SOI) areas and the transitions between these different regions result in significant SD implant pattern critical dimension variations. The large number of stack variations involved in these effects implies a complex modeling to simulate pattern degradations. This paper deals with the characterization of stack effects on 28nm node using SOI substrates. The large number of measurements allows to highlight all individual and combined stack effects. A new modeling flow has been developed in order to generate wafer stack aware OPC model. The accuracy and the prediction of the model is presented in this paper.

  11. Quality metric for accurate overlay control in <20nm nodes

    NASA Astrophysics Data System (ADS)

    Klein, Dana; Amit, Eran; Cohen, Guy; Amir, Nuriel; Har-Zvi, Michael; Huang, Chin-Chou Kevin; Karur-Shanmugam, Ramkumar; Pierson, Bill; Kato, Cindy; Kurita, Hiroyuki

    2013-04-01

    The semiconductor industry is moving toward 20nm nodes and below. As the Overlay (OVL) budget is getting tighter at these advanced nodes, the importance in the accuracy in each nanometer of OVL error is critical. When process owners select OVL targets and methods for their process, they must do it wisely; otherwise the reported OVL could be inaccurate, resulting in yield loss. The same problem can occur when the target sampling map is chosen incorrectly, consisting of asymmetric targets that will cause biased correctable terms and a corrupted wafer. Total measurement uncertainty (TMU) is the main parameter that process owners use when choosing an OVL target per layer. Going towards the 20nm nodes and below, TMU will not be enough for accurate OVL control. KLA-Tencor has introduced a quality score named `Qmerit' for its imaging based OVL (IBO) targets, which is obtained on the-fly for each OVL measurement point in X & Y. This Qmerit score will enable the process owners to select compatible targets which provide accurate OVL values for their process and thereby improve their yield. Together with K-T Analyzer's ability to detect the symmetric targets across the wafer and within the field, the Archer tools will continue to provide an independent, reliable measurement of OVL error into the next advanced nodes, enabling fabs to manufacture devices that meet their tight OVL error budgets.

  12. Taking the X Architecture to the 65-nm technology node

    NASA Astrophysics Data System (ADS)

    Sarma, Robin C.; Smayling, Michael C.; Arora, Narain; Nagata, Toshiyuki; Duane, Michael P.; Shah, Santosh; Keston, Harris J.; Oemardani, Shiany

    2004-05-01

    The X Architecture is a new way of orienting the interconnect on an integrated circuit using diagonal pathways, as well as the traditional right-angle, or Manhattan, configuration. By enabling designs with significantly less wire and fewer vias, the X Architecture can provide substantial improvements in chip performance, power consumption and cost. Members of the X Initiative semiconductor supply chain consortium have demonstrated the production worthiness of the X Architecture at the 130-nm and 90-nm process technology nodes. This paper presents an assessment of the manufacturing readiness of the X Architecture for the 65-nm technology node. The extent to which current production capabilities in mask writing, lithography, wafer processing, inspection and metrology can be used is discussed using the results from a 65-nm test chip. The project was a collaborative effort amongst a number of companies in the IC fabrication supply chain. Applied Materials fabricated the 65-nm X Architecture test chip at its Maydan Technology Center and leveraged the technology of other X Initiative members. Cadence Design Systems provided the test structure design and chip validation tools, Dai Nippon Printing produced the masks and Canon"s imaging system was employed for the photolithography.

  13. Enabling 22-nm logic node with advanced RET solutions

    NASA Astrophysics Data System (ADS)

    Farys, V.; Depre, L.; Finders, J.; Arnoux, V.; Trouiller, Y.; Liu, H. Y.; Yesilada, E.; Zeggaoui, N.; Alleaume, C.

    2011-04-01

    The 22-nm technology node presents a real breakthrough compared to previous nodes in the way that state of the art scanner will be limited to a numerical aperture of 1.35. Thus we cannot "simply" apply a shrink factor from the previous node, and tradeoffs have to be found between Design Rules, Process integration and RET solutions in order to maintain the 50% density gain imposed by the Moore's law. One of the most challenging parts to enable the node is the ability to pattern Back-End Holes and Metal layers with sufficient process window. It is clearly established that early process for these layers will be performed by double patterning technique coupled with advanced OPC solutions. In this paper we propose a cross comparison between possible double patterning solutions: Pitch Splitting (PS) and Sidewall Image Transfer (SIT) and their implication on design rules and CD Uniformity. Advanced OPC solutions such as Model Based SRAF and Source Mask Optimization will also be investigated in order to ensure good process control. This work is a part of the Solid's JDP between ST, ASML and Brion in the framework of Nano2012 sponsored by the French government.

  14. Novel high sensitivity EUV photoresist for sub-7nm node

    NASA Astrophysics Data System (ADS)

    Nagai, Tomoki; Nakagawa, Hisashi; Naruoka, Takehiko; Tagawa, Seiichi; Oshima, Akihiro; Nagahara, Seiji; Shiraishi, Gosuke; Yoshihara, Kosuke; Terashita, Yuichi; Minekawa, Yukie; Buitrago, Elizabeth; Ekinci, Yasin; Yildirim, Oktay; Meeuwissen, Marieke; Hoefnagels, Rik; Rispens, Gijsbert; Verspaget, Coen; Maas, Raymond

    2016-03-01

    Extreme ultraviolet lithography (EUVL) has been recognized as the most promising candidate for the manufacture of semiconductor devices for the 7 nm node and beyond. A key point in the successful introduction of EUV lithography in high volume manufacture (HVM) is the effective EUV dose utilization while simultaneously realizing ultra-high resolution and low line edge roughness (LER). Here we show EUV resist sensitivity improvement with the use of a photosensitized chemically amplified resist PSCARTM system. The evaluation of this new chemically amplified resist (CAR) as performed using EUV interference lithography (EUV-IL) is described and the fundamentals are discussed.

  15. MoSi absorber photomask for 32nm node

    NASA Astrophysics Data System (ADS)

    Konishi, Toshio; Kojima, Yosuke; Takahashi, Hiroyuki; Tanabe, Masato; Haraguchi, Takashi; Lamantia, Matthew; Fukushima, Yuichi; Okuda, Yoshimitsu

    2008-05-01

    The development of semiconductor process for 32nm node is in progress. Immersion lithography has been introduced as an extension of 193nm lithograpy. In addition, DPL (Double patterning lithography) is becoming a strong candidate of next generation lithography. The extension of optical lithography increases more mask complexity and tighter specification of photomasks. CD performance is the most important issue in the advanced photomask technology. However, it is expected that conventional mask cannot satisfy the required mask specifications for 32nm node and beyond. Most of CD errors are contributed to the dry etching process. Mask CD variation is greatly influenced by the loading effect from dry etching of the absorber. As the required accuracy of the mask arises, Cr absorber thickness has been gradually thinner. CD linearity with the thinner Cr absorber thickness has better performance. However, it is difficult to apply thinner Cr absorber thickness simply under the condition of OD > 3, which is needed for wafer printing. So, we adopted MoSi absorber instead of conventional Cr absorber, because MoSi absorber has less micro and global loading effect than that of Cr absorber. By using MoSi absorber, we can reduce Cr thickness as a hardmask. The thinner Cr hardmask allows for reduce resist thickness and become same condition for conventional EB resist lithography. The lithography performances were confirmed by the simulation and wafer printing. The new MoSi absorber mask behaves similar to the conventional Cr absorber mask. The adoption of super thin Cr as a hardmask made it possible to reduce resist thickness. By the application of the thin resist and the latest tools, we'll improve the mask performance to meet the 32 nm generation specification.

  16. NXT:1980Di immersion scanner for 7nm and 5nm production nodes

    NASA Astrophysics Data System (ADS)

    de Graaf, Roelof; Weichselbaum, Stefan; Droste, Richard; McLaren, Matthew; Koek, Bert; de Boeij, Wim

    2016-03-01

    Immersion scanners remain the critical lithography workhorses in semiconductor device manufacturing. When progressing towards the 7nm device node for logic and D18 device node for DRAM production, pattern-placement and layer-to-layer overlay requirements keep progressively scaling down and consequently require system improvements in immersion scanners. The on-product-overlay requirements are approaching levels of only a few nanometers, imposing stringent requirements on the scanner tool design in terms of reproducibility, accuracy and stability. In this paper we report on the performance of the NXT:1980Di immersion scanner. The NXT:1980Di builds upon the NXT:1970Ci, that is widely used for 16nm, 14nm and 10nm high-volume manufacturing. We will discuss the NXT:1980Di system- and sub-system/module enhancements that drive the scanner overlay, focus and productivity performance. Overlay, imaging, focus, productivity and defectivity data will be presented for multiple tools. To further reduce the on-product overlay system performance, alignment sensor contrast improvements as well as active reticle temperature conditioning are implemented on the NXT:1980Di. Reticle temperature conditioning will reduce reticle heating overlay and the higher contrast alignment sensor will improve alignment robustness for processed alignment targets. Due to an increased usage of multiple patterning techniques, an increased number of immersion exposures is required. NXT:1980Di scanner design modifications raised productivity levels from 250wph to 275wph. This productivity enhancement provides lower cost of ownership (CoO) for customers using immersion technology.

  17. Megasonic cleaning: possible solutions for 22nm node and beyond

    NASA Astrophysics Data System (ADS)

    Shende, Hrishi; Singh, Sherjang; Baugh, James; Mann, Raunak; Dietze, Uwe; Dress, Peter

    2011-11-01

    Megasonic energy transfer to the photomask surface is indirectly controlled by process parameters that provide an effective handle to physical force distribution on the photomask surface. A better understanding of the influence of these parameters on the physical force distribution and their effect on pattern damage of fragile mask features can help optimize megasonic energy transfer as well as assist in extending this cleaning technology beyond the 22nm node. In this paper we have specifically studied the effect of higher megasonic frequencies (3 & 4MHz) and media gasification on pattern damage; the effect of cleaning chemistry, media volume flow rate, process time, and nozzle distance to the mask surface during the dispense is also discussed. Megasonic energy characterization is performed by measuring the acoustic energy as well as cavitation created by megasonic energy through sonoluminescence measurements.

  18. Cell projection use in maskless lithography for 45nm and 32nm logic nodes

    NASA Astrophysics Data System (ADS)

    Manakli, S.; Komami, H.; Takizawa, M.; Mitsuhashi, T.; Pain, L.

    2009-03-01

    Due to the ever-increasing cost of equipment and mask complexity, the use of optical lithography for integrated circuit manufacturing is increasingly more complex and expensive. Recent workshops and conferences in semiconductor lithography underlined that one alternative to support sub-32nm technologies is mask-less lithography option using electron beam technology. However, this direct write approach based on variable shaped beam principle (VSB) is not sufficient in terms of throughput, i.e. of productivity. New direct write techniques like multibeam systems are under development, but these solutions will not be mature before 2012. The use of character/cell projection (CP) on industrial VSB tools is the first step to deal with the throughput concerns. This paper presents the status of the CP technology and evaluates its possible use for the 45nm and 32nm logic nodes. It will present standard cell and SRAM structures that are printed as single characters using the CP technique. All experiments are done using the Advantest tool (F3000) which can project up to 100 different cells per layer. Cell extractions and design have been performed with the design and software solution developed by D2S. In this paper, we first evaluate the performance gain that can be obtained with the CP approach compared to the standard VSB approach. This paper also details the patterning capability obtained by using the CP concept. An evaluation of the CD uniformity and process stability is also presented. Finally this paper discusses about the improvements of this technique to address high resolution and to improve the throughput concerns.

  19. Extension of 193 nm dry lithography to 45-nm half-pitch node: double exposure and double processing technique

    NASA Astrophysics Data System (ADS)

    Biswas, Abani M.; Li, Jianliang; Hiserote, Jay A.; Melvin, Lawrence S., III

    2006-10-01

    Immersion lithography and multiple exposure techniques are the most promising methods to extend lithography manufacturing to the 45nm node. Although immersion lithography has attracted much attention recently as a promising optical lithography extension, it will not solve all the problems at the 45-nm node. The 'dry' option, (i.e. double exposure/etch) which can be realized with standard processing practice, will extend 193-nm lithography to the end of the current industry roadmap. Double exposure/etch lithography is expensive in terms of cost, throughput time, and overlay registration accuracy. However, it is less challenging compared to other possible alternatives and has the ability to break through the κ I barrier (0.25). This process, in combination with attenuated PSM (att-PSM) mask, is a good imaging solution that can reach, and most likely go beyond, the 45-nm node. Mask making requirements in a double exposure scheme will be reduced significantly. This can be appreciated by the fact that the separation of tightly-pitched mask into two less demanding pitch patterns will reduce the stringent specifications for each mask. In this study, modeling of double exposure lithography (DEL) with att-PSM masks to target 45-nm node is described. In addition, mask separation and implementation issues of optical proximity corrections (OPC) to improve process window are studied. To understand the impact of OPC on the process window, Fourier analysis of the masks has been carried out as well.

  20. Gaps analysis for CD metrology beyond the 22nm node

    NASA Astrophysics Data System (ADS)

    Bunday, Benjamin; Germer, Thomas A.; Vartanian, Victor; Cordes, Aaron; Cepler, Aron; Settens, Charles

    2013-04-01

    This paper will examine the future for critical dimension (CD) metrology. First, we will present the extensive list of applications for which CD metrology solutions are needed, showing commonalities and differences among the various applications. We will then report on the expected technical limits of the metrology solutions currently being investigated by SEMATECH and others in the industry to address the metrology challenges of future nodes, including conventional CD scanning electron microscopy (CD-SEM) and optical critical dimension (OCD) metrology and new potential solutions such as He-ion microscopy (HeIM, sometimes elsewhere referred to as HIM), CD atomic force microscopy (CD-AFM), CD small-angle x-ray scattering (CD-SAXS), high-voltage scanning electron microscopy (HV-SEM), and other types. A technical gap analysis matrix will then be demonstrated, showing the current state of understanding of the future of the CD metrology space.

  1. Thin hardmask patterning stacks for the 22-nm node

    NASA Astrophysics Data System (ADS)

    Zhu, Zhimin; Piscani, Emil; Wang, Yubao; Macie, Jan; Neef, Charles J.; Smith, Brian

    2009-03-01

    This paper presents robust trilayer lithography technology for cutting-edge IC fabrication and double-patterning applications. The goal is to reduce the thickness of a silicon hardmask so that the minimum thickness of the photoresist is not limited by the etch budget and can be optimized for lithography performance. Successful results of pattern etching through a 300-nm carbon layer are presented to prove that a 13.5-nm silicon hardmask is thick enough to transfer the line pattern. Another highlight of this work is the use of a simulation tool to design the stack so that UV light is concentrated at the bottom of the trenches. This design helps to clear the resist in the trenches and prevent resist top loss. An experiment was designed to validate the assumption with 45-nm dense lines at various exposure doses, using an Exitech MS-193i immersion microstepper (NA = 1.3) at the SEMATECH Resist Test Center. Results show that such a stack design obtains very wide CD processing window and is robust for 1:3 line patterning at the diffraction limit, as well as for patterning small contact holes.

  2. Characterization of 32nm node BEOL grating structures using scatterometry

    NASA Astrophysics Data System (ADS)

    Zangooie, Shahin; Sendelbach, Matthew; Angyal, Matthew; Archie, Charles; Vaid, Alok; Matthew, Itty; Herrera, Pedro

    2008-03-01

    Implementations of scatterometry in the back end of the line (BEOL) of the devices requires design of advanced measurement targets with attention to CMP ground rule constraints as well as model simplicity details. In this paper we outline basic design rules for scatterometry back end targets by stacking and staggering measurement pads to reduce metal pattern density in the horizontal plane of the device and to avoid progressive dishing problems along the vertical direction. Furthermore, important characteristics of the copper shapes in terms of their opaqueness and uniformity are discussed. It is shown that the M1 copper thicknesses larger than 100 nm are more than sufficient for accurate back end scatterometry implementations eliminating the need for modeling of contributions from the buried layers. AFM and ellipsometry line scans also show that the copper pads are sufficiently uniform with a sweet spot area of around 20 μm. Hence, accurate scatterometry can be done with negligible edge and/or dishing contributions if the measurement spot is placed any where within the sweet spot area. Reference metrology utilizing CD-SEM and CD-AFM techniques prove accuracy of the optical solutions for the develop inspect and final inspect grating structures. The total measurement uncertainty (TMU) values for the process of record line width are of the order of 0.77 nm and 0.35 nm at the develop inspect and final inspect levels, respectively.

  3. Imaging performance and challenges of 10nm and 7nm logic nodes with 0.33 NA EUV

    NASA Astrophysics Data System (ADS)

    van Setten, Eelco; Schiffelers, Guido; Psara, Eleni; Oorschot, Dorothe; Davydova, Natalia; Finders, Jo; Depre, Laurent; Farys, Vincent

    2014-10-01

    The NXE:3300B is ASML's third generation EUV system and has an NA of 0.33 and is positioned at a resolution of 22nm, which can be extended down to 18nm and below with off-axis illumination at full transmission. Multiple systems have been qualified and installed at customers. The NXE:3300B succeeds the NXE:3100 system (NA of 0.25), which has allowed customers to gain valuable EUV experience. It is expected that EUV will be adopted first for critical Logic layers at 10nm and 7nm nodes, such as Metal-1, to avoid the complexity of triple patterning schemes using ArF immersion. In this paper we will evaluate the imaging performance of (sub-)10nm node Logic M1 on the NXE:3300B EUV scanner. We will show the line-end performance of tip-to-tip and tip-to-space test features for various pitches and illumination settings and the performance enhancement obtained by means of a 1st round of OPC. We will also show the magnitude of local variations. The Logic M1 cell is evaluated at various critical features to identify hot spots. A 2nd round OPC model was calibrated of which we will show the model accuracy and ability to predict hot spots in the Logic M1 cell. The calibrated OPC model is used to predict the expected performance at 7nm node Logic using off-axis illumination at 16nm minimum half pitch. Initial results of L/S exposed on the NXE:3300B at 7nm node resolutions will be shown. An outlook is given to future 0.33 NA systems on the ASML roadmap with enhanced illuminator capabilities to further improve performance and process window.

  4. Radiation Performance of 1 Gbit DDR SDRAMs Fabricated in the 90 nm CMOS Technology Node

    NASA Technical Reports Server (NTRS)

    Ladbury, Raymond L.; Gorelick, Jerry L.; Berg, M. D.; Kim, H.; LaBel, K.; Friendlich, M.; Koga, R.; George, J.; Crain, S.; Yu, P.; Reed, R. A.

    2006-01-01

    We present Single Event Effect (SEE) and Total Ionizing Dose (TID) data for 1 Gbit DDR SDRAMs (90 nm CMOS technology) as well as comparing this data with earlier technology nodes from the same manufacturer.

  5. Imaging budgets for EUV optics: ready for 22-nm node and beyond

    NASA Astrophysics Data System (ADS)

    Bienert, Marc; Göhnemeier, Aksel; Natt, Oliver; Lowisch, Martin; Gräupner, Paul; Heil, Tilmann; Garreis, Reiner; van Ingen Schenau, Koen; Hansen, Steve

    2009-03-01

    We derive an imaging budget from the performance of EUV optics with NA = 0.32, and demonstrate that the 22nm node requirements are met. Based on aerial image simulations, we analyze the impact of all relevant contributors, ranging from conventional quantities, like straylight or aberrations, to EUV-specific topics, namely influence of 3D mask effects and facetted illumination pupils. As test structures we consider dense to isolated lines, contact holes, and 2D elbows. We classify the contributions in a hierarchical order according to their weight in the CDU budget and identify the main drivers. The underlying physical mechanisms causing different contributions to be critical or less significant are clarified. Finally, we give an outlook for the 16nm and 11nm nodes. Future developments in optics manufacturing will keep the budgets controlled, thereby paving the way to enable printing of these upcoming nodes.

  6. Lithographic performance comparison with various RET for 45-nm node with hyper NA

    NASA Astrophysics Data System (ADS)

    Adachi, Takashi; Inazuki, Yuichi; Sutou, Takanori; Kitahata, Yasuhisa; Morikawa, Yasutaka; Toyama, Nobuhito; Mohri, Hiroshi; Hayashi, Naoya

    2006-05-01

    In order to realize 45 nm node lithography, strong resolution enhancement technology (RET) and water immersion will be needed. In this research, we discussed about various RET performance comparison for 45 nm node using 3D rigorous simulation. As a candidate, we chose binary mask (BIN), several kinds of attenuated phase-shifting mask (att-PSM) and chrome-less phase-shifting lithography mask (CPL). The printing performance was evaluated and compared for each RET options, after the optimizing illumination conditions, mask structure and optical proximity correction (OPC). The evaluation items of printing performance were CD-DOF, contrast-DOF, conventional ED-window and MEEF, etc. It's expected that effect of mask 3D topography becomes important at 45 nm node, so we argued about not only the case of ideal structures, but also the mask topography error effects. Several kinds of mask topography error were evaluated and we confirmed how these errors affect to printing performance.

  7. Implementation of templated DSA for via layer patterning at the 7nm node

    NASA Astrophysics Data System (ADS)

    Gronheid, Roel; Doise, Jan; Bekaert, Joost; Chan, Boon Teik; Karageorgos, Ioannis; Ryckaert, Julien; Vandenberghe, Geert; Cao, Yi; Lin, Guanyang; Somervell, Mark; Fenger, Germain; Fuchimoto, Daisuke

    2015-03-01

    In recent years major advancements have been made in the directed self-assembly (DSA) of block copolymers (BCP). Insertion of DSA for IC fabrication is seriously considered for the 7nm node. At this node the DSA technology could alleviate costs for double patterning and limit the number of masks that would be required per layer. At imec multiple approaches for inserting DSA into the 7nm node are considered. One of the most straightforward approaches for implementation would be for via patterning through templated DSA (grapho-epitaxy), since hole patterns are readily accessible through templated hole patterning of cylindrical phase BCP materials. Here, the pre-pattern template is first patterned into a spin-on hardmask stack. After optimizing the surface properties of the template the desired hole patterns can be obtained by the BCP DSA process. For implementation of this approach to be implemented for 7nm node via patterning, not only the appropriate process flow needs to be available, but also appropriate metrology (including for pattern placement accuracy) and DSA-aware mask decomposition are required. In this paper the imec approach for 7nm node via patterning will be discussed.

  8. Defect inspection and printability study for 14 nm node and beyond photomask

    NASA Astrophysics Data System (ADS)

    Seki, Kazunori; Yonetani, Masashi; Badger, Karen; Dechene, Dan J.; Akima, Shinji

    2016-10-01

    Two different mask inspection techniques are developed and compared for 14 nm node and beyond photomasks, High resolution and Litho-based inspection. High resolution inspection is the general inspection method in which a 19x nm wavelength laser is used with the High NA inspection optics. Litho-based inspection is a new inspection technology. This inspection uses the wafer lithography information, and as such, this method has automatic defect classification capability which is based on wafer printability. Both High resolution and Litho-based inspection methods are compared using 14 nm and 7 nm node programmed defect and production design masks. The defect sensitivity and mask inspectability is compared, in addition to comparing the defect classification and throughput. Additionally, the Cost / Infrastructure comparison is analyzed and the impact of each inspection method is discussed.

  9. Writing time estimation of EB mask writer EBM-9000 for hp16nm/logic11nm node generation

    NASA Astrophysics Data System (ADS)

    Kamikubo, Takashi; Takekoshi, Hidekazu; Ogasawara, Munehiro; Yamada, Hirokazu; Hattori, Kiyoshi

    2014-10-01

    The scaling of semiconductor devices is slowing down because of the difficulty in establishing their functionality at the nano-size level and also because of the limitations in fabrications, mainly the delay of EUV lithography. While multigate devices (FinFET) are currently the main driver for scalability, other types of devices, such as 3D devices, are being realized to relax the scaling of the node. In lithography, double or multiple patterning using ArF immersion scanners is still a realistic solution offered for the hp16nm node fabrication. Other lithography candidates are those called NGL (Next Generation Lithography), such as DSA (Directed-Self-Assembling) or nanoimprint. In such situations, shot count for mask making by electron beam writers will not increase. Except for some layers, it is not increasing as previously predicted. On the other hand, there is another aspect that increases writing time. The exposure dose for mask writing is getting higher to meet tighter specifications of CD uniformity, in other words, reduce LER. To satisfy these requirements, a new electron beam mask writer, EBM-9000, has been developed for hp16nm/logic11nm generation. Electron optical system, which has the immersion lens system, was evolved from EBM-8000 to achieve higher current density of 800A/cm2. In this paper, recent shot count and dose trend are discussed. Also, writing time is estimated for the requirements in EBM-9000.

  10. Sustainability and applicability of spacer-related patterning towards 7nm node

    NASA Astrophysics Data System (ADS)

    Oyama, Kenichi; Yamauchi, Shohei; Hara, Arisa; Natori, Sakurako; Yamato, Masatoshi; Okabe, Noriaki; Koike, Kyohei; Yaegashi, Hidetami

    2015-03-01

    Self-aligned multiple patterning technique has enabled the further down scaling through 193 immersion lithography extension [1-5]. In particular, focus on the logic device scaling, we have finished the verification of patterning technology of up to 10nm node [6-7], we will discuss about some patterning technologies that are required to 7nm node. For critical layers in FinFET devices that presume a 1D cell design, there is also a need not just for the scaling of grating patterns but also for pattern cutting process. In 7nm node, cutting number increase in metal or fin layer, and also pattern splitting of contact or via is complicated, so both cost reduction and process controllability including EPE are strongly required. For example, inverse hardmask scheme in metal layer can improve CD variation of the Cu wiring. Furthermore hole pattern shrink technology in contact layer, by the combination with the exposure technique which has k1 0.25 or less, can achieve both cost reduction and reducing the numbers of pitch splitting. This paper presents the possibility of immersion-based multiple patterning techniques for up to 7nm node.

  11. Imaging challenges in 20nm and 14nm logic nodes: hot spots performance in Metal1 layer

    NASA Astrophysics Data System (ADS)

    Timoshkov, V.; Rio, D.; Liu, H.; Gillijns, W.; Wang, J.; Wong, P.; Van Den Heuvel, D.; Wiaux, V.; Nikolsky, P.; Finders, J.

    2013-10-01

    The 20nm Metal1 layer, based on ARM standard cells, has a 2D design with minimum pitch of 64nm. This 2D design requires a Litho-Etch-Litho-Etch (LELE) double patterning. The whole design is divided in 2 splits: Me1A and Me1B. But solution of splitting conflicts needs stitching at some locations, what requires good Critical Dimension (CD) and overlay control to provide reliable contact between 2 stitched line ends. ASML Immersion NXT tools are aimed at 20 and 14nm logic production nodes. Focus control requirements become tighter, as existing 20nm production logic layouts, based on ARM, have about 50-60nm focus latitude and tight CD Uniformity (CDU) specifications, especially for line ends. IMEC inspected 20nm production Metal1 ARM standard cells with a Negative Tone Development (NTD) process using the Process Window Qualification-like technique experimentally and by Brion Tachyon LMC by simulations. Stronger defects were found thru process variations. A calibrated Tachyon model proved a good overall predictability capability for this process. Selected defects are likely to be transferred to hard mask during etch. Further, CDU inspection was performed for these critical features. Hot spots showed worse CD uniformity than specifications. Intra-field CDU contribution is significant in overall CDU budget, where reticle has major impact due to high MEEF of hot spots. Tip-to-Tip and tip-to-line hot spots have high MEEF and its variation over the field. Best focus variation range was determined by best focus offsets between hot spots and its variation within the field.

  12. Particle removal challenges with EUV patterned mask for the sub-22nm HP node

    SciTech Connect

    Rastegar, A.; Eichenlaub, S.; Kadaksham, A. J.; Lee, B.; House, M.; Huh, S.; Cha, B.; Yun, H.; Mochi, I.; Goldberg, K. A.

    2010-03-12

    The particle removal efficiency (PRE) of cleaning processes diminishes whenever the minimum defect size for a specific technology node becomes smaller. For the sub-22 nm half-pitch (HP) node, it was demonstrated that exposure to high power megasonic up to 200 W/cm{sup 2} did not damage 60 nm wide TaBN absorber lines corresponding to the 16 nm HP node on wafer. An ammonium hydroxide mixture and megasonics removes {ge}50 nm SiO{sub 2} particles with a very high PRE, A sulfuric acid hydrogen peroxide mixture (SPM) in addition to ammonium hydroxide mixture (APM) and megasonic is required to remove {ge}28 nm SiO{sub 2} particles with a high PRE. Time-of-flight secondary ion mass spectroscopy (TOFSIMS) studies show that the presence of O{sub 2} during a vacuum ultraviolet (VUV) ({lambda} = 172 nm) surface conditioning step will result in both surface oxidation and Ru removal, which drastically reduce extreme ultraviolet (EUV) mask life time under multiple cleanings. New EUV mask cleaning processes show negligible or no EUV reflectivity loss and no increase in surface roughness after up to 15 cleaning cycles. Reviewing of defect with a high current density scanning electron microscope (SEM) drastically reduces PRE and deforms SiO{sub 2} particles. 28 nm SiO{sub 2} particles on EUV masks age very fast and will deform over time, Care must be taken when reviewing EUV mask defects by SEM. Potentially new particles should be identified to calibrate short wavelength inspection tools, Based on actinic image review, 50 nm SiO{sub 2} particles on top of the EUV mask will be printed on the wafer.

  13. Joint-optimization for SRAM and logic for 28nm node and below

    NASA Astrophysics Data System (ADS)

    Verhaegen, Staf; Smayling, Michael C.; De Bisschop, Peter; Laenens, Bart

    2010-03-01

    In current and next generation nodes lithography is pushed to low k1 lithography imaging regimes. A gridded design approach with lines and cuts has previously been shown to allow optimizing illuminator conditions for critical layers in logic designs.[1] The approach has shown good pattern fidelity and is expected to be scalable to the 7nm logic node. [2] A regular pattern for logic makes the optimization problem straightforward if only standard cells are used in a chip.[3,4] However, modern SOC's include large amounts of SRAM as well. The proposed approach truly optimizes both, instead of the conventional approach of sacrificing the SRAM because of logic layouts with bends and multiple pitches. The biggest problem in co-optimizing logic cells and SRAM bit cells is the orientation of critical layers. For SRAMs, the gate and metal1 layers have lines in parallel directions, while in standard cells they are perpendicular. This would require abandoning dipole illumination for the combined optimization, and at best using some form of quadrupole. The alternative is to design the logic and SRAMs to be unified from the beginning. In this case, critical layer orientations as well as pitches could be matched and each of the layers optimized for both functional sets of patterns. Choices of patterns can be made to achieve DSMO (Design-Source-Mask-Optimization). In the 28nm to 22nm logic nodes - with contacted pitches from 110nm to 90nm and metal1 pitches from 90nm to 70nm - one of the questions to answer is when and for which layers double patterning is needed. The limit of single patterning immersion lithography can only be explored through a smart combination of restricted designs and powerful sourcemask optimization tools. In this paper a 28nm SRAM block with bit and word line periphery will be used to look at choices for Design-Source-Mask-Optimization.

  14. Considering mask pellicle effect for more accurate OPC model at 45nm technology node

    NASA Astrophysics Data System (ADS)

    Wang, Ching-Heng; Liu, Qingwei; Zhang, Liguo

    2008-11-01

    Now it comes to the 45nm technology node, which should be the first generation of the immersion micro-lithography. And the brand-new lithography tool makes many optical effects, which can be ignored at 90nm and 65nm nodes, now have significant impact on the pattern transmission process from design to silicon. Among all the effects, one that needs to be pay attention to is the mask pellicle effect's impact on the critical dimension variation. With the implement of hyper-NA lithography tools, light transmits the mask pellicle vertically is not a good approximation now, and the image blurring induced by the mask pellicle should be taken into account in the computational microlithography. In this works, we investigate how the mask pellicle impacts the accuracy of the OPC model. And we will show that considering the extremely tight critical dimension control spec for 45nm generation node, to take the mask pellicle effect into the OPC model now becomes necessary.

  15. Double patterning in lithography for 65nm node with oxidation process

    NASA Astrophysics Data System (ADS)

    Jeong, Eunsoo; Kim, Jeahee; Choi, Kwangsun; Lee, Minkon; Lee, Doosung; Kim, Myungsoo; Park, Chansik

    2008-03-01

    Recently, in order to increase the number of transistors in wafer by small feature size, optical lithography has been changed to low wavelength from 365nm to 193nm and high NA of 0.93. And further wavelength is aggressively shifting to 13.5nm for more small feature size, i.e., Extreme Ultra Violet Lithography(EUVL), a kind of Next Generation Lithography(NGL)1. And other technologies are developed such as water immersion(193nm) and photo resist Double Patterning(DP). Immersion lens system has high NA up to 1.3 due to high n of water(n=1.44 at 193nm), the parameter k1 is process constant, but 0.25 is a tough limit at a equal line and space, if we use immersion lens with 193nm wavelength than limit of resolution is 37nm. Especially, Double Exposure Technique(DET) process is widely studied because of the resolution enhancement ability using a same material and machine, despite of process complication. And SADP(Self Aligned Double Patten) is newly researched for overlay and LER(Line Edge Roughness) enhancement. In this paper, we illustrate the feasibility of the shift double pattern for 65nm-node flash using a 193nm light dipole source and the possibility of decrease minimum feature size using a property of silicon shrinkage during thermal oxidation process.

  16. Photomask etch system and process for 10nm technology node and beyond

    NASA Astrophysics Data System (ADS)

    Chandrachood, Madhavi; Grimbergen, Michael; Yu, Keven; Leung, Toi; Tran, Jeffrey; Chen, Jeff; Bivens, Darin; Yalamanchili, Rao; Wistrom, Richard; Faure, Tom; Bartlau, Peter; Crawford, Shaun; Sakamoto, Yoshifumi

    2015-10-01

    While the industry is making progress to offer EUV lithography schemes to attain ultimate critical dimensions down to 20 nm half pitch, an interim optical lithography solution to address an immediate need for resolution is offered by various integration schemes using advanced PSM (Phase Shift Mask) materials including thin e-beam resist and hard mask. Using the 193nm wavelength to produce 10nm or 7nm patterns requires a range of optimization techniques, including immersion and multiple patterning, which place a heavy demand on photomask technologies. Mask schemes with hard mask certainly help attain better selectivity and hence better resolution but pose integration challenges and defectivity issues. This paper presents a new photomask etch solution for attenuated phase shift masks that offers high selectivity (Cr:Resist > 1.5:1), tighter control on the CD uniformity with a 3sigma value approaching 1 nm and controllable CD bias (5-20 nm) with excellent CD linearity performance (<5 nm) down to the finer resolution. The new system has successfully demonstrated capability to meet the 10 nm node photomask CD requirements without the use of more complicated hard mask phase shift blanks. Significant improvement in post wet clean recovery performance was demonstrated by the use of advanced chamber materials. Examples of CD uniformity, linearity, and minimum feature size, and etch bias performance on 10 nm test site and production mask designs will be shown.

  17. Design and manufacturability tradeoffs in unidirectional and bidirectional standard cell layouts in 14 nm node

    NASA Astrophysics Data System (ADS)

    Vaidyanathan, Kaushik; Ng, Siew Hoon; Morris, Daniel; Lafferty, Neal; Liebmann, Lars; Bender, Mitchell; Huang, Wenbin; Lai, Kafai; Pileggi, Larry; Strojwas, Andrzej

    2012-03-01

    The 14 nm node is seeing the dominant use of three-dimensional FinFET architectures, local interconnects, multiple patterning processes and restricted design rules. With the adoption of these new process technologies and design styles, it becomes necessary to rethink the standard cell library design methodologies that proved successful in the past. In this paper, we compare the design efficiency and manufacturability of standard cell libraries that use either unidirectional or bidirectional Metal 1. In contrast to previous nodes, a 14 nm 9-track unidirectional standard cell layout results in up to 20% lower energy-delay-area product as compared to the 9-track bidirectional standard cell layout. Manufacturability assessment shows that the unidirectional standard cell layouts save one exposure on Metal 1, reduces process variability by 10% and layout construct count by 2-3X. As a result, the unidirectional standard cell layout could serve as a key enabler for affordable scaling.

  18. Holistic overlay control for multi-patterning process layers at the 10nm and 7nm nodes

    NASA Astrophysics Data System (ADS)

    Verstappen, Leon; Mos, Evert; Wardenier, Peter; Megens, Henry; Schmitt-Weaver, Emil; Bhattacharyya, Kaustuve; Adam, Omer; Grzela, Grzegorz; van Heijst, Joost; Willems, Lotte; Wildenberg, Jochem; Ignatova, Velislava; Chen, Albert; Elich, Frank; Rajasekharan, Bijoy; Vergaij-Huizer, Lydia; Lewis, Brian; Kea, Marc; Mulkens, Jan

    2016-03-01

    Multi-patterning lithography at the 10-nm and 7-nm nodes is driving the allowed overlay error down to extreme low values. Advanced high order overlay correction schemes are needed to control the process variability. Additionally the increase of the number of split layers results in an exponential increase of metrology complexity of the total overlay and alignment tree. At the same time, the process stack includes more hard-mask steps and becomes more and more complex, with as consequence that the setup and verification of the overlay metrology recipe becomes more critical. All of the above require a holistic approach that addresses total overlay optimization from process design to process setup and control in volume manufacturing. In this paper we will present the holistic overlay control flow designed for 10-nm and 7-nm nodes and illustrate the achievable ultimate overlay performance for a logic and DRAM use case. As figure 1 illustrates we will explain the details of the steps in the holistic flow. Overlay accuracy is the driver for target design and metrology tool optimization like wavelength and polarization. We will show that it is essential to include processing effects like etching and CMP which can result in a physical asymmetry of the bottom grating of diffraction based overlay targets. We will introduce a new method to create a reference overlay map, based on metrology data using multiple wavelengths and polarization settings. A similar approach is developed for the wafer alignment step. The overlay fingerprint correction using linear or high order correction per exposure (CPE) has a large amount of parameters. It is critical to balance the metrology noise with the ultimate correction model and the related metrology sampling scheme. Similar approach is needed for the wafer align step. Both for overlay control as well as alignment we have developed methods which include efficient use of metrology time, available for an in the litho-cluster integrated

  19. Integrated scatterometry for tight overlay and CD control to enable 20-nm node wafer manufacturing.

    NASA Astrophysics Data System (ADS)

    Benschop, Jos; Engelen, Andre; Cramer, Hugo; Kubis, Michael; Hinnen, Paul; van der Laan, Hans; Bhattacharyya, Kaustuve; Mulkens, Jan

    2013-04-01

    The overlay, CDU and focus requirements for the 20nm node can only be met using a holistic lithography approach whereby full use is made of high-order, field-by-field, scanner correction capabilities. An essential element in this approach is a fast, precise and accurate in-line metrology sensor, capable to measure on product. The capabilities of the metrology sensor as well as the impact on overlay, CD and focus will be shared in this paper.

  20. Immersion and dry scanner extensions for sub-10nm production nodes

    NASA Astrophysics Data System (ADS)

    Weichselbaum, Stefan; Bornebroek, Frank; de Kort, Toine; Droste, Richard; de Graaf, Roelof F.; van Ballegoij, Rob; Botter, Herman; McLaren, Matthew G.; de Boeij, Wim P.

    2015-03-01

    Progressing towards the 10nm and 7nm imaging node, pattern-placement and layer-to-layer overlay requirements keep on scaling down and drives system improvements in immersion (ArFi) and dry (ArF/KrF) scanners. A series of module enhancements in the NXT platform have been introduced; among others, the scanner is equipped with exposure stages with better dynamics and thermal control. Grid accuracy improvements with respect to calibration, setup, stability, and layout dependency tighten MMO performance and enable mix and match scanner operation. The same platform improvements also benefit focus control. Improvements in detectability and reproducibility of low contrast alignment marks enhance the alignment solution window for 10nm logic processes and beyond. The system's architecture allows dynamic use of high-order scanner optimization based on advanced actuators of projection lens and scanning stages. This enables a holistic optimization approach for the scanner, the mask, and the patterning process. Productivity scanner design modifications esp. stage speeds and optimization in metrology schemes provide lower layer costs for customers using immersion lithography as well as conventional dry technology. Imaging, overlay, focus, and productivity data is presented, that demonstrates 10nm and 7nm node litho-capability for both (immersion & dry) platforms.

  1. Development of a new high transmission phase shift mask technology for 10 nm logic node

    NASA Astrophysics Data System (ADS)

    Faure, Thomas; Sakamoto, Yoshifumi; Toda, Yusuke; Badger, Karen; Seki, Kazunori; Lawliss, Mark; Isogawa, Takeshi; Zweber, Amy; Kagawa, Masayuki; Wistrom, Richard; Xu, Yongan; Lobb, Granger; Viswanathan, Ramya; Hu, Lin; Inazuki, Yukio; Nishikawa, Kazuhiro

    2016-05-01

    In this paper we will describe the development of a new 12% high transmission phase shift mask technology for use with the 10 nm logic node. The primary motivation for this work was to improve the lithographic process window for 10 nm node via hole patterning by reducing the MEEF and improving the depth of focus (DOF). First, the simulated MEEF and DOF data will be compared between the 6% and high T PSM masks with the transmission of high T mask blank varying from 12% to 20%. This resulted in selection of a 12% transmission phase shift mask. As part of this work a new 12% attenuated phase shift mask blank was developed. A detailed description and results of the key performance metrics of the new mask blank including radiation durability, dry etch properties, film thickness, defect repair, and defect inspection will be shared. In addition, typical mask critical dimension uniformity and mask minimum feature size performance for 10 nm logic node via level mask patterns will be shown. Furthermore, the results of work to optimize the chrome hard mask film properties to meet the final mask minimum feature size requirements will be shared. Lastly, the key results of detailed lithographic performance comparisons of the process of record 6% and new 12% phase shift masks on wafer will be described. The 12% High T blank shows significantly better MEEF and larger DOF than those of 6% PSM mask blank, which is consistent with our simulation data.

  2. Challenges in the Plasma Etch Process Development in the sub-20nm Technology Nodes

    NASA Astrophysics Data System (ADS)

    Kumar, Kaushik

    2013-09-01

    For multiple generations of semiconductor technologies, RF plasmas have provided a reliable platform for critical and non-critical patterning applications. The electron temperature of processes in a RF plasma is typically several electron volts. A substantial portion of the electron population is within the energy range accessible for different types of electron collision processes, such as electron collision dissociation and dissociative electron attachment. When these electron processes occur within a small distance above the wafer, the neutral species, radicals and excited molecules, generated from these processes take part in etching reactions impacting selectivity, ARDE and micro-loading. The introduction of finFET devices at 22 nm technology node at Intel marks the transition of planar devices to 3-dimensional devices, which add to the challenges to etch process in fabricating such devices. In the sub-32 nm technology node, Back-end-of-the-line made a change with the implementation of Trench First Metal Hard Mask (TFMHM) integration scheme, which has hence gained traction and become the preferred integration of low-k materials for BEOL. This integration scheme also enables Self-Aligned Via (SAV) patterning which prevents via CD growth and confines via by line trenches to better control via to line spacing. In addition to this, lack of scaling of 193 nm Lithography and non-availability of EUV based lithography beyond concept, has placed focus on novel multiple patterning schemes. This added complexity has resulted in multiple etch schemes to enable technology scaling below 80 nm Pitches, as shown by the memory manufacturers. Double-Patterning and Quad-Patterning have become increasingly used techniques to achieve 64 nm, 56 nm and 45 nm Pitch technologies in Back-end-of-the-line. Challenges associated in the plasma etching of these multiple integration schemes will be discussed in the presentation. In collaboration with A. Ranjan, TEL Technology Center, America

  3. Analysis of multi-e-beam lithography for cutting layers at 7-nm node

    NASA Astrophysics Data System (ADS)

    Zhao, Lijun; Wei, Yayi; Ye, Tianchun

    2016-10-01

    Technology node scaling to the 7-nm node, self-aligned quadruple patterning plus cutting/blocking is widely adopted as a lithography solution for critical line and space layers. The cutting/blocking process can be done by 193i or EUV lithography. Due to resolution requirements in both X/Y directions, 193i requires two or three exposures to accomplish the cutting/blocking process, and the overlay among the exposures must be controlled very tightly. EUV can accomplish cutting/blocking by one exposure. However, the extremely high cost of EUV tool and mask, together with not so high throughput, appears to suggest that EUV lithography is not a cost-effective solution. From both technical and cost perspectives, we explore the possibility of using multi-e-beam lithography as an alternative solution for 7-nm cutting/blocking layers. First, we analyze design rules, which define resolution and overlay requirements of the cutting/blocking patterns. Then we report the lithography performance data of our leading-edge multi-e-beam tool and compare them with the cutting/blocking requirements. Finally, we do the cost analysis. Our results indicate that multi-e-beam lithography has a cost per wafer per layer advantage if it can commit a resolution of 32-nm half pitch, an overlay of <2.8 nm, and a throughput of 5 to 10 wph.

  4. Gate patterning in 14 nm and beyond nodes: from planar devices to three dimensional Finfet devices

    NASA Astrophysics Data System (ADS)

    Meng, Lingkuan; Hong, Peizhen; He, Xiaobin; Li, Chunlong; Li, Junjie; Li, Junfeng; Zhao, Chao; Wei, Yayi; Yan, Jiang

    2016-01-01

    In this work, we investigated the challenges encountered in 14 nm node Finfet gate patterning. The patterning process was originated from a 22 nm planar device, in which a SiO2/Si3N4/SiO2 (ONO) multilayer was used as an etch mask. To accommodate with the 3D nature of Finfet structures in 14 nm node, the thickness of Si3N4 has been increased in the investigated process. We found out that the standard ONO mask etch process was no longer effective for gate patterning in 3D Finfet devices. It was observed that the etched mask sidewall was significantly more tapered than that in planar devices, resulting in the final CDs of both mask and dummy gate far wider than those of the planar devices. In order to achieve a desirable gate CD, the formation mechanism causing a severely tapered mask profile was first investigated. Our results suggested that redeposition effect of the etch products on the sidewall played a significant role in controlling etched mask sidewall angle. Then, we proposed a two-step etch process which can improve the anisotropy of ONO mask etch and obtain a steep etch profile with a desirable CD. Using this process, a gate CD of 20 nm was successfully achieved with a desirable profile and a smooth sidewall. Our results have demonstrated that the newly developed etch process is very robust and has a wide process window.

  5. The SEMATECH Berkeley microfield exposure tool: learning a the 22-nm node and beyond

    SciTech Connect

    Naulleau, Patrick; Anderson, Christopher; Baclea-an, Lorie-Mae; Denham, Paul; George, Simi; Goldberg, Kenneth A.; Goldstein, Michael; Hoef, Brian; Hudyma, Russ; Jones, Gideon; Koh, Chawon; La Fontaine, Bruno; McClinton, Brittany; Miyakawa, Ryan; Montgomery, Warren; Roller, John; Wallow, Tom; Wurm, Stefan

    2009-02-16

    Microfield exposure tools (METs) continue to playa dominant role in the development of extreme ultraviolet (EUV) resists. One of these tools is the SEMATECH Berkeley 0.3-NA MET operating as a SEMATECH resist and mask test center. Here we present an update summarizing the latest resist test and characterization results. The relatively small numerical aperture and limited illumination settings expected from 1st generation EUV production tools make resist resolution a critical issue even at the 32-nm node. In this presentation, sub 22 nm half pitch imaging results of EUV resists are reported. We also present contact hole printing at the 30-nm level. Although resist development has progressed relatively well in the areas of resolution and sensitivity, line-edge-roughness (LER) remains a significant concern. Here we present a summary of recent LER performance results and consider the effect of system-level contributors to the LER observed from the SEMA TECH Berkeley microfield tool.

  6. Development and characterization of advanced phase-shift mask blanks for 14nm node and beyond

    NASA Astrophysics Data System (ADS)

    Kim, Chang-Jun; Jang, Kyu-Jin; Choi, Min-Ki; Yang, Chul-Kyu; Lee, Jae-Chul; Lee, Jong-Keun; Kang, Byung-Sun; Lee, Jong-Hwa; Shin, Cheol; Nam, Kee-Soo

    2014-10-01

    Recently, the development of semiconductor process for 14nm node and beyond is in progress. The mask-making process demands higher resolution and CD accuracy to meet requirements. Current conventional ArF PSM has several problems such as higher 3D effect and higher loading effect due to the thicker film. These problems cause the CD performance degradation. This study is about the manufacturing of advance ArF PSM, which has thinner phase shift layer and higher etch rate Cr absorber film. The thickness of phase shift film is less than 60nm and the total etch-time for the Cr absorber film is reduced more than 30%. The mask CD performance of this new blank was evaluated in terms of CD uniformity, CD linearity, pattern resolution, and loading effect and so on. Adapting to this new blank, we can achieve better CD performance by reducing the loading effect. In addition, the chemical durability and ArF exposure durability were also improved. In conclusion, the mask-making process margin was extended by using this new blank, and it is expected that we can achieve the required specifications for 14nm node and beyond.

  7. Immersion defectivity study with volume production immersion lithography tool for 45 nm node and below

    NASA Astrophysics Data System (ADS)

    Nakano, Katsushi; Nagaoka, Shiro; Yoshida, Masato; Iriuchijima, Yasuhiro; Fujiwara, Tomoharu; Shiraishi, Kenichi; Owa, Soichi

    2008-03-01

    Volume production of 45nm node devices utilizing Nikon's S610C immersion lithography tool has started. Important to the success in achieving high-yields in volume production with immersion lithography has been defectivity reduction. In this study we evaluate several methods of defectivity reduction. The tools used in our defectivity analysis included a dedicated immersion cluster tools consisting of a Nikon S610C, a volume production immersion exposure tool with NA of 1.3, and a resist coater-developer LITHIUS i+ from TEL. In our initial procedure we evaluated defectivity behavior by comparing on a topcoat-less resist process to a conventional topcoat process. Because of its simplicity the topcoatless resist shows lower defect levels than the topcoat process. In a second study we evaluated the defect reduction by introducing the TEL bevel rinse and pre-immersion bevel cleaning techniques. This technique was shown to successfully reduce the defect levels by reducing the particles at the wafer bevel region. For the third defect reduction method, two types of tool cleaning processes are shown. Finally, we discuss the overall defectivity behavior at the 45nm node. To facilitate an understanding of the root cause of the defects, defect source analysis (DSA) was applied to separate the defects into three classes according to the source of defects. DSA analysis revealed that more than 99% of defects relate to material and process, and less than 1% of the defects relate to the exposure tool. Material and process optimization by collaborative work between exposure tool vendors, track vendors and material vendors is a key for success of 45nm node device manufacturing.

  8. Mask and wafer cost of ownership (COO) from 65 to 22 nm half-pitch nodes

    NASA Astrophysics Data System (ADS)

    Hughes, Greg; Litt, Lloyd C.; Wüest, Andrea; Palaiyanur, Shyam

    2008-05-01

    Anticipating the cost of ownership (COO) of different lithography approaches into the future is an act of faith. It requires that one believe that all of the lithographic problems with next generation lithography (NGL) approaches will be sufficiently resolved to support the production of manufacturing wafers. This paper assumes that all of the necessary technologies will be available in the future and that the cost of the components can be extrapolated from historic cost trends. Mask and wafer costs of a single critical lithography layer for the 65, 45, 32 and 22 nm half-pitch (HP) nodes will be compared for immersion, double process (DP), double expose (DE), extreme ultraviolet (EUV), and imprint technologies. The mask COO analysis assumes that the basic yield of an optical mask is constant from node to node and that the infrastructure that allows this performance will be in place when the technologies are needed. The primary differences in mask costs among lithography approaches are driven by the patterning write time and materials. The wafer COO is driven by the mask cost (for the low wafer-per-mask use case), the lithography tool cost, and the effective wafers per hour (wph) for the lithography approach being considered.

  9. Electron beam mask writer EBM-9500 for logic 7nm node generation

    NASA Astrophysics Data System (ADS)

    Matsui, Hideki; Kamikubo, Takashi; Nakahashi, Satoshi; Nomura, Haruyuki; Nakayamada, Noriaki; Suganuma, Mizuna; Kato, Yasuo; Yashima, Jun; Katsap, Victor; Saito, Kenichi; Kobayashi, Ryoei; Miyamoto, Nobuo; Ogasawara, Munehiro

    2016-10-01

    Semiconductor scaling is slowing down because of difficulties of device manufacturing below logic 7nm node generation. Various lithography candidates which include ArF immersion with resolution enhancement technology (like Inversed Lithography technology), Extreme Ultra Violet lithography and Nano Imprint lithography are being developed to address the situation. In such advanced lithography, shot counts of mask patterns are estimated to increase explosively in critical layers, and then it is hoped that multi beam mask writer (MBMW) is released to handle them within realistic write time. However, ArF immersion technology with multiple patterning will continue to be a mainstream lithography solution for most of the layers. Then, the shot counts in less critical layers are estimated to be stable because of the limitation of resolution in ArF immersion technology. Therefore, single beam mask writer (SBMW) can play an important role for mask production still, relative to MBMW. Also the demand of SBMW seems actually strong for the logic 7nm node. To realize this, we have developed a new SBMW, EBM-9500 for mask fabrication in this generation. A newly introduced electron beam source enables higher current density of 1200A/cm2. Heating effect correction function has also been newly introduced to satisfy the requirements for both pattern accuracy and throughput. In this paper, we will report the configuration and performance of EBM-9500.

  10. Efficient large volume data preparation for electron beam lithography for sub-45nm node

    NASA Astrophysics Data System (ADS)

    Choi, Kang-Hoon; Gutsch, Manuela; Freitag, Martin; Hohle, Christoph; Martin, Luc; Bayle, Sebastien; Manakli, Serdar; Schiavone, Patrick

    2011-11-01

    A new correction approach was developed to improve the process window of electron beam lithography and push its resolution at least one generation further using the same exposure tool. An efficient combination of dose and geometry modulation is implemented in the commercial data preparation software, called Inscale®, from Aselta Nanographics. Furthermore, the electron Resolution Improvement Feature (eRIF) is tested, which is based on the dose modulation and multiple-pass exposure, for not only overcoming the narrow resist process windows and disability of exposure tool but also more accurate correction of exposure data in the application of sub-35nm regime. Firstly, we are demonstrating the newly developed correction method through the comparison of its test exposure and the one with conventional dose modulation method. Secondly, the electron Resolution Improvement Feature is presented with the test application for complementary exposure and with the application of real design, specifically for sub-30nm nodes. Finally, we discuss the requirements of data preparation for the practical applications in e-beam lithography, especially for future technology nodes.

  11. Across scanner platform optimization to enable EUV lithography at the 10-nm logic node

    NASA Astrophysics Data System (ADS)

    Mulkens, Jan; Karssenberg, Jaap; Wei, Hannah; Beckers, Marcel; Verstappen, Leon; Hsu, Stephen; Chen, Guangqin

    2014-04-01

    EUV lithography is expected to be introduced in volume manufacturing at the 10-nm and 7-nm node. Especially in these first EUV nodes, critical layer patterning will be balanced with the use of ArF immersion. As a consequence a good overlay and placement matching between both lithography methods becomes an enabling factor for EUV. In this paper we present an integral method to optimize critical layer patterning across the EUV and ArF scanner platform, such that good overlay and device pattern placement is achieved. It is discussed that besides classical overlay control methods, also the optimization of the ArF and EUV imaging steps is needed. Best matching is achieved by applying high-order field-to-field overlay corrections for both imaging and overlay. The lithography architecture we build for these higher order corrections connects the dynamic scanner actuators with the angle resolved scatterometer via a separate computational application server. Improvements of CD uniformity are based on source mask optimization for EUV combined with CD optimization using freeform intra-field dose actuator in the immersion scanner.

  12. Defect avoidance for EUV photomask readiness at the 7 nm node

    NASA Astrophysics Data System (ADS)

    Qi, Zhengqing John; Rankin, Jed; Narita, Eisuke; Kagawa, Masayuki

    2016-05-01

    Several challenges hinder extreme ultraviolet lithography (EUVL) photomask fabrication and its readiness for high volume manufacturing (HVM). The lack in availability of pristine defect-free blanks as well as the absence of a robust mask repair technique mandates defect mitigation through pattern shift for the production of defect-free photomasks. The work presented here provides a comprehensive look at pattern shift implementation to intersect EUV HVM for the 7 nm technology node. An empirical error budget to compensate for measurement variability and errors, based on the latest HVM inspection and write tool capabilities, is first established and then experimentally verified. The validated error budget is applied to 20 representative EUV blanks and pattern shift is performed on fully functional 7 nm node chip designs. The probability of defect-free masks is explored for various layers, including metal, contact, and gate cut layers. From these results, an assessment is made on the current viability of defect-free EUV masks and what is required to construct a complete defect-free EUV mask set.

  13. Process window simulation study with immersion lithography for 45-nm technology node

    NASA Astrophysics Data System (ADS)

    Park, Oseo; Gutmann, Alois; Neumueller, Walter; Back, David

    2004-05-01

    As the potentials of experimental studies are still limited, a predictive resist image simulation of Immersion lithography is very important for a better understanding of the technology. One of the most critical issues in Immersion lithography is the description of the influence of immersion which is the presence of a uniform liquid layer between the last objective lens and the photo resist, on optical lithography. It enables the real part of the index of refraction in the image space, and the numerical aperture of the projection lens, to be greater than unity. Therefore, it is virtually involves Maxwell vector solution approach, including polarization effects and arbitrary thin film multi-layers. This paper discusses the improvement in process window afforded by immersion under a variety of conditions, including 193nm and 157nm, Off-axis illumination, Attenuated Phase Shift Mask for 65nm and 45nm technology node. Comparisons with dry and liquid lithography simulations are used to evaluate the availability and the performance of the proposed approach. The implemented resist simulation approach is examined the impact to the process window of variations in liquid refractive index as well.

  14. UV-NIL templates for the 22nm node and beyond

    NASA Astrophysics Data System (ADS)

    Hiraka, Takaaki; Yusa, Satoshi; Fujii, Akiko; Sasaki, Shiho; Itoh, Kimio; Toyama, Nobuhito; Kurihara, Masaaki; Mohri, Hiroshi; Hayashi, Naoya

    2007-10-01

    NIL (nano-imprint lithography) is expected as one of the lithographic candidates for 32nm node and beyond. Recently, the small line edge roughness (LER) as well as the potentially high resolution that will ensure no-OPC mask feature is attracting many researchers. However, the NIL needs 1X patterns on template and a transit from 4X to 1X is a big and hard technology jump for the mask industry. The fine resolution pattern making on the template is one of the most critical issues for the realization of NIL. In this paper, as a continuation of our previous works 1-5, we have achieved further resolution by optimizing the materials, their thicknesses, the developing and the etching processes, as well as the writing parameters of the 100keV SB (spot beam) writer. At the best resolved point on the template, resolutions down to hp (half pitch) 18nm on dense line patterns, hp20nm on dense hole patterns, and hp26nm on dense dot patterns were confirmed. Concerning stable pattern resolution over a certain field area, we evaluated pattern resolution through over a 250um square area, which we think would be adequate for initial imprint tests. For the 250μm square area, we confirmed pattern resolution of hp24nm for dense line patterns and hp32nm for dense hole patterns. In addition, we have studied resolution limit of the 50keV VSB (variable shaped beam) photomask production writing tools, which have been commonly used tools in the 4X photomask manufacturing for larger field size patterning. Materials, process conditions and parameters acquired through the 100keV SB process were implanted, and we could fabricate templates with hp32nm dense line patterns, with acceptable full chip uniformity and writing time. We also studied the imprint capability, and fabricated a template with fine features and imprinted it onto a wafer. As a result, we could transfer hp24nm dense line patterns, hp24nm dense hole patterns, and hp32nm dense dot patterns onto the wafer.

  15. Development and characterization of a thinner binary mask absorber for 22-nm node and beyond

    NASA Astrophysics Data System (ADS)

    Faure, Tom; Badger, Karen; Kindt, Louis; Kodera, Yutaka; Komizo, Toru; Kondo, Shinpei; Mizoguchi, Takashi; Nemoto, Satoru; Seki, Kazunori; Senna, Tasuku; Wistrom, Richard; Zweber, Amy; Nishikawa, Kazuhiro; Inazuki, Yukio; Yoshikawa, Hiroki

    2010-09-01

    The lithography challenges posed by the 22 nm node continue to place stringent requirements on photomasks. The dimensions of the mask features continue to shrink more deeply into the sub-wavelength scale. In this regime residual mask electromagnetic field (EMF) effects due to mask topography can degrade the imaging performance of critical mask patterns by degrading the common lithography process window and by magnifying the impact of mask errors or MEEF. Based on this, an effort to reduce the mask topography effect by decreasing the thickness of the mask absorber was conducted. In this paper, we will describe the results of our effort to develop and characterize a binary mask substrate with an absorber that is approximately 20-25% thinner than the absorber on the current Opaque MoSi on Glass (OMOG) binary mask substrate. For expediency, the thin absorber development effort focused on using existing absorber materials and deposition methods. It was found that significant changes in film composition and structure were needed to obtain a substantially thinner blank while maintaining an optical density of 3.0 at 193 nm. Consequently, numerous studies to assess the mask making performance of the thinner absorber material were required and will be described. During these studies several significant mask making advantages of the thin absorber were discovered. The lower film stress and thickness of the new absorber resulted in improved mask flatness and up to a 60% reduction in process-induced mask pattern placement change. Improved cleaning durability was another benefit. Furthermore, the improved EMF performance of the thinner absorber [1] was found to have the potential to relieve mask manufacturing constraints on minimum opaque assist feature size and opaque corner to corner gap. Based on the results of evaluations performed to date, the thinner absorber has been found to be suitable for use for fabricating masks for the 22 nm node and beyond.

  16. Mask roughness and its implications for LER at the 22- and 16-nm nodes

    SciTech Connect

    Naulleau, Patrick; George, Simi A.; McClinton, Brittany M.

    2010-02-16

    Line-edge roughness (LER) remains the most significant challenge facing the development of extreme ultraviolet (EUV) resist. The mask, however, has been found to be a significant contributor to image-plane LER. This has long been expected based on modeling and has more recently been demonstrated experimentally. Problems arise from both mask-absorber LER as well as mask multilayer roughness leading to random phase variations in the reflected beam and consequently speckle. Understanding the implications this has on mask requirements for the 22-nm half pitch node and below is crucial. Modeling results indicate a replicated surface roughness (RSR) specification of 50 pm and a ruthenium capping layer roughness specification of 440 pm. Moreover, modeling indicates that it is crucial to achieve the current ITRS specifications for mask absorber LER which is significantly smaller than current capabilities.

  17. Optimum Biasing for 45 nm Node Chromeless and Attenuated Phase Shift Mask

    NASA Astrophysics Data System (ADS)

    Kang, Young-Min; An, Ilsin; Shin, Dong-Soo; Oh, Hye-Keun

    2008-09-01

    Resolution enhancement technology (RET) refers to a technique that extends the usable resolution of an imaging system without decreasing the wavelength of light or increasing the numerical aperture (NA) of the imaging tool. Off-axis illumination (OAI) and a phase shift mask (PSM) are essentially accompanied by optical proximity correction (OPC) for semiconductor device manufacturing nowadays. A chromeless PSM is compared with an attenuated PSM (att.PSM) to generate a 45 nm dense line and space pattern. To obtain the best possible resolution, a suitable OPC is required with PSM and the most common application of OPC is the use of bias. An optical system with a high NA, a strong OAI, and a proper polarization can decrease k1 to a value well below 0.3. A chromeless PSM has various advantages over alternating PSM such as the lack of necessity for double exposure, small pattern displacement, and the lack of critical dimension (CD) error caused by intensity imbalance. However, a chromeless PSM has some disadvantages. In the case of a 100% transmittance pure chromeless PSM, there is no shading material that is usually deposited on the line pattern for both att.PSM and alternating PSM to control linewidth. Because there is no shading material for such a chromeless PSM, the required resist CD has to be obtained using phase only and it is difficult to control the resist CD through pitch. As expected, a chromeless PSM needs a smaller dose than an att.PSM to generate a desired 45 nm CD with a 1.0 NA. Our simulation results show that a 10 nm bias is optimum for chromeless PSMs. We demonstrate that chromeless PSM and att.PSM technology can be used to achieve a 45 nm node with optimum biased OPC.

  18. Optimum biasing for 45 nm node chromeless and attenuated phase shift mask

    NASA Astrophysics Data System (ADS)

    Kang, Young-Min; Oh, Hye-Keun

    2008-03-01

    Resolution enhancement technology (RET) refers to a technique that extends the usable resolution of an imaging system without decreasing the wavelength of light or increasing the numerical aperture (NA) of the imaging tool. Offaxis illumination (OAI) and a phase shift mask (PSM) are essentially accompanied by optical proximity correction (OPC) for semiconductor device manufacturing nowadays. A chromeless PSM (CLM or CPL) is compared to an attenuated PSM (att.PSM) to make 45 nm dense line and space pattern. To obtain the best possible resolution, a proper OPC is required with CPL and the most common application of OPC technique is the use of space bias. The optical system with a high numerical aperture (NA), a strong OAI, and a proper polarization can decrease the k1 value well below 0.3. CPL has various advantages over alternating PSM such as no necessity of double exposure, small pattern displacement, and no CD error caused by the intensity imbalance. But CPL has some disadvantages. In the case of 100 % transmittance pure CPL, there is no shading material that is usually deposited on the line pattern for both att.PSM and alternating PSM to control the line width. Because of no shading material for CPL, the required resist critical dimension (CD) has to be obtained by using phase only and it is difficult to control the resist CD through pitch. As expected, CPL needs smaller dose than att.PSM to make the desired 45 nm CD with 0.94 NA. Our simulation results showed that 10 nm negative bias is optimum for CPL mask. We demonstrated that CPL mask and att.PSM technology can be used to make 45 nm node by the negative space bias.

  19. Characterization of bending CD errors induced by resist trimming in 65 nm node and beyond

    NASA Astrophysics Data System (ADS)

    Gu, Yiming; Friedmann, James B.; Ukraintsev, Vladimir; Zhang, Gary; Wolf, Thomas; Lii, Tom; Jackson, Ricky

    2007-03-01

    Resist trimming is a technique that is often used to close the gap between line widths which can be repeatedly printed with currently available lithography tools and the desired transistor gate length. For the 65-nm node, the resist line width delivered at pattern is between 60 to 70 nm while the final transistor gate length is usually targeted between 35 to 45 nm. The 15 to 35 nm critical dimension (CD) difference can be bridged by resist trimming. Due to the stringent gate CD budget, a resist trimming process should ideally have the following characteristics: i) no degradation in CD uniformity; ii) no damage in pattern fidelity; iii) controllable CD trim rate with good linearity; and iv) no degradation in line edge roughness (LER) or line width roughness (LWR). Unfortunately, a realistic resist trimming process is never perfect. In particular, resist consumption and the resultant internal stress build-up during resist trimming can lead to resist line bending. The effect of bent resist lines is a higher post-etch CD and significantly degraded local CD uniformity (LCDU). In order to reduce resist bending CD errors (defined as the difference between the post-etch CD and the design CD due to resist bending after trimming) several useful procedures either in layout or in processes are presented. These procedures include: i) symmetrically aligning gates to contact pads and field connecting poly in the circuit layout; ii) enlarging the distance between contact pad (or field connecting poly) to active area within the limits of the design rules (DR) and silicon real estate; iii) adding assist features to the layout within the DR limits; iv) minimizing resist thickness; and v) applying special plasma cure before resist trim.

  20. Resolution enhancement technology for ArF dry lithography at 65 nm node

    NASA Astrophysics Data System (ADS)

    Gao, Songbo; Li, Yanqui

    2007-12-01

    The performance of ArF dry lithography at 65 nm node was studied together with RET. Commercial software Prolith 9.0 and in-house-software MicroCruiser 5.0 were used for simulation and mass data process. The combination of different phase shift mask (PSM), off axis illumination and patterns were chosen for this research. The image contrast, nominal image log-slope (NILS), depth of focus (DOF) and resist profile were considered to judge the lithography performance. The results show that the combination of small sigma conventional illumination and alternating phase shift mask (alt- PSM) is the best choice for Line/Space (L/S) patterns of different pitches. The isolate L/S pattern can be imaged with a large image contrast and DOF if alt-PSM and several kinds of illumination (such as small sigma, annular, and quasar illumination) are joined together. For semi-dense and dense L/S pattern, good lithography performance can be reached by using only small sigma illumination and alt-PSM. The impact of polarization illumination was also considered. Y-polarization illumination enhances the image contrast, NILS and the DOF for most conditions. The Z-orientation resist image fidelity was studied by optimization of the double bottom anti-reflection coating (DBARC) and resist thickness. This research predicts that 65 nm L/S pattern can be fabricated by current ArF dry lithography system.

  1. Improving CD uniformity using MB-MDP for 14nm node and beyond

    NASA Astrophysics Data System (ADS)

    Kim, Byung G.; Choi, Jin; Park, Jisoong; Jeon, Chan U.; Watson, Sterling; Adamov, Anthony; Pack, Bob; Bork, Ingo

    2012-11-01

    Model-Based Mask Data Preparation (MB-MDP) has been discussed in the literature for its benefits in reducing mask write times [1][2]. By being model based (i.e., simulation based), overlapping shots, per-shot dose modulation, and circular and other character projection shots are enabled. This reduces variable shaped beam (VSB) shot count for complex mask shapes, and particularly ideal ILT shapes [3]. In this paper, the authors discuss another even more important aspect of MB-MDP. MB-MDP enhances CD Uniformity (CDU) on the mask, and therefore on the wafer. Mask CDU is improved for sub-80nm features on mask through the natural increase in dose that overlapping provides, and through per-shot dose modulation. The improvement in CDU is at the cost of some write times for the less complex EUV masks with only rectangular features. But these masks do not have the basis of large write times that come from complex SRAFs. For ArF masks for the critical layers at the 20nm logic node and below, complex SRAFs are unavoidable. For these shapes, MB-MDP enhances CDU while simultaneously reducing write times. Simulated and measured comparison of conventional methodology and MB-MDP methodology are presented.

  2. Low-contrast photoresist development model for OPC application at 10nm node

    NASA Astrophysics Data System (ADS)

    Wu, Cheng-En; Wei, David; Zhang, Charlie; Song, Hua

    2015-03-01

    The Optical Proximity Correction (OPC) model, a key to process yield in the mask synthesis flow, is getting more and more complicated and challenging at advanced technology nodes (1X nm). To achieve accurate critical dimension (CD) prediction and model robustness on varied designed patterns, a rigorously tuned compact model (RTCM) [1] that takes the photoresist chemical effects into considerations is strongly desired. A lithography process consists of three main stages: Exposure, Post-Exposure Bake (PEB), and Photoresist Development. Each stage is characterized by its fundamental physics or chemistry that governs the process of illumination induced photo-acid generation, thermally activated chemical reaction-diffusion, and developer dependent photoresist dissolution, respectively. The final resist profile is determined by the process details of all these stages directly or indirectly. For an ideal resist that the development contrast approaches infinity, resist development is aptly represented by a threshold model applied to the PEB latent image (acid or inhibitor concentration). So the quality of OPC modeling is largely determined by the fidelity of PEB latent image [2,3]. However, for some types of resist and developer used in Negative Tone Development (NTD), the development contrast shows a long tail without a sharp transition. For such low-contrast resist, the developed resist profile is no longer described well by the equilevel surface of PEB latent image. Going beyond the threshold approximation, we start from the fundamental equations of resist development physics and analyze the time evolution of development front that determines the resist profile. In this paper, a new compact model is derived to catch the main physics in resist Development, which is also simple and computationally efficient to suit for OPC applications. Comparison with S-LITHO rigorous solutions and real-wafer experiments with 1D and 2D test patterns have showed that the new compact model

  3. Hybrid OPC modeling with SEM contour technique for 10nm node process

    NASA Astrophysics Data System (ADS)

    Hitomi, Keiichiro; Halle, Scott; Miller, Marshal; Graur, Ioana; Saulnier, Nicole; Dunn, Derren; Okai, Nobuhiro; Hotta, Shoji; Yamaguchi, Atsuko; Komuro, Hitoshi; Ishimoto, Toru; Koshihara, Shunsuke; Hojo, Yutaka

    2014-03-01

    Hybrid OPC modeling is investigated using both CDs from 1D and simple 2D structures and contours extracted from complex 2D structures, which are obtained by a Critical Dimension-Scanning Electron Microscope (CD-SEM). Recent studies have addressed some of key issues needed for the implementation of contour extraction, including an edge detection algorithm consistent with conventional CD measurements, contour averaging and contour alignment. Firstly, pattern contours obtained from CD-SEM images were used to complement traditional site driven CD metrology for the calibration of OPC models for both metal and contact layers of 10 nm-node logic device, developed in Albany Nano-Tech. The accuracy of hybrid OPC model was compared with that of conventional OPC model, which was created with only CD data. Accuracy of the model, defined as total error root-mean-square (RMS), was improved by 23% with the use of hybrid OPC modeling for contact layer and 18% for metal layer, respectively. Pattern specific benefit of hybrid modeling was also examined. Resist shrink correction was applied to contours extracted from CD-SEM images in order to improve accuracy of the contours, and shrink corrected contours were used for OPC modeling. The accuracy of OPC model with shrink correction was compared with that without shrink correction, and total error RMS was decreased by 0.2nm (12%) with shrink correction technique. Variation of model accuracy among 8 modeling runs with different model calibration patterns was reduced by applying shrink correction. The shrink correction of contours can improve accuracy and stability of OPC model.

  4. A 2x2 W-Band Reference Time-Shifted Phase-Locked Transmitter Array in 65nm CMOS Technology

    NASA Technical Reports Server (NTRS)

    Tang, Adrian; Virbila, Gabriel; Hsiao, Frank; Wu, Hao; Murphy, David; Mehdi, Imran; Siegel, P. H.; Chang, M-C. Frank

    2013-01-01

    This paper presents a complete 2x2 phased array transmitter system operating at W-band (90-95 GHz) which employs a PLL reference time-shifting approach instead of using traditional mm-wave phase shifters. PLL reference shifting enables a phased array to be distributed over multiple chips without the need for coherent mm-wave signal distribution between chips. The proposed phased array transmitter system consumes 248 mW per array element when implemented in a 65 nm CMOS technology.

  5. Estimate design sensitivity to process variation for the 14nm node

    NASA Astrophysics Data System (ADS)

    Landié, Guillaume; Farys, Vincent

    2016-03-01

    Looking for the highest density and best performance, the 14nm technological node saw the development of aggressive designs, with design rules as close as possible to the limit of the process. Edge placement error (EPE) budget is now tighter and Reticle Enhancement Techniques (RET) must take into account the highest number of parameters to be able to get the best printability and guaranty yield requirements. Overlay is a parameter that must be taken into account earlier during the design library development to avoid design structures presenting a high risk of performance failure. This paper presents a method taking into account the overlay variation and the Resist Image simulation across the process window variation to estimate the design sensitivity to overlay. Areas in the design are classified with specific metrics, from the highest to the lowest overlay sensitivity. This classification can be used to evaluate the robustness of a full chip product to process variability or to work with designers during the design library development. The ultimate goal is to evaluate critical structures in different contexts and report the most critical ones. In this paper, we study layers interacting together, such as Contact/Poly area overlap or Contact/Active distance. ASML-Brion tooling allowed simulating the different resist contours and applying the overlay value to one of the layers. Lithography Manufacturability Check (LMC) detectors are then set to extract the desired values for analysis. Two different approaches have been investigated. The first one is a systematic overlay where we apply the same overlay everywhere on the design. The second one is using a real overlay map which has been measured and applied to the LMC tools. The data are then post-processed and compared to the design target to create a classification and show the error distribution. Figure:

  6. Mandrel-based patterning: density multiplication techniques for 15nm nodes

    NASA Astrophysics Data System (ADS)

    Bencher, Chris; Dai, Huixiong; Miao, Liyan; Chen, Yongmei; Xu, Ping; Chen, Yijian; Oemardani, Shiany; Sweis, Jason; Wiaux, Vincent; Hermans, Jan; Chang, Li-Wen; Bao, Xinyu; Yi, He; Wong, H.-S. Philip

    2011-04-01

    In many ways, sidewall spacer double patterning has created a new paradigm for lithographic roadmaps. Instead of using lithography as the principal process for generating device features, the role of lithography becomes to generate a mandrel (a pre-pattern) off-of-which one will subsequently replicate patterns with various degrees of density multiplication. Under this new paradigm, the innovativeness of various density multiplication techniques is as critical to the scaling roadmap as the exposure tools themselves. Sidewall spacer double patterning was the first incarnation of mandrel based patterning; adopted quickly in NAND flash where layouts were simple and design space was focused. But today, the use of advanced automated decomposition tools are showing spacer based patterning solutions for very complex logic designs. Future incarnations can involve the use of laminated spacers to create quadruple patterning or by retaining the original mandrel as a method to obtain triple patterning. Directed self-assembly is yet another emerging embodiment of mandrel based patterning, where selfseparating polymers are registered and guided by the physical constraint of a mandrel or by chemical pre-pattern trails formed onto the substrate. In this summary of several bodies of work, we will review several wafer level demonstrations, all of which use various forms of mandrel or stencil based density multiplication including sidewall spacer based double, triple and quadruple patterning techniques for lines, SADP for via multiplication, and some directed self-assembly results all capable of addressing 15nm technology node requirements and below. To address concerns surrounding spacer double patterning design restrictions, we show collaboration results with an EDA partner to demonstrate SADP capability for BEOL routing layers. To show the ultimate realization of SADP, we partner with IMEC on multiple demonstrations of EUV+SADP.

  7. Patterning of 90nm node flash contact hole with assist feature using KrF

    NASA Astrophysics Data System (ADS)

    Shim, Yeonah; Jun, Sungho; Choi, Jaeyoung; Choi, Kwangseon; Han, Jae-won; Wang, Kechang; McCarthy, John; Xiao, Guangming; Dai, Grace; Son, DongHwan; Zhou, Xin; Cecil, Thomas; Kim, David; Baik, KiHo

    2009-10-01

    Patterning of contact holes using KrF lithography system is one of the most challenging tasks for the sub-90nm technology node,. Contact hole patterns can be printed with a KrF lithography system using Off-Axis Illumination (OAI) such as Quasar or Quadrupole. However, such a source usually offers poor image contrast and poor depth of focus (DOF), especially for isolated contact holes. In addition to image contrast and DOF, circularity of hole shape is also an important parameter for device performance. Sub-resolution assist features (SRAF) can be used to improve the image contrast, DOF and circularity for isolated contact holes. Application of SRAFs, modifies the intensity profile of isolated features to be more like dense ones, improving the focal response of the isolated feature. The insertion of SRAFs in a contact design is most commonly done using rule-based scripting, where the initial rules for configuring the SRAFs are derived using a simulation tool to determining the distance of assist features to main feature, and the size and number of assist features to be used.. However in the case of random contact holes, rule-based SRAF placement is a nearly impossible task. To address this problem, an inverse lithography technique was successfully used to treat random contact holes. The impact of SRAF configuration on pattern profile, especially circularity and process margin, is demonstrated. It is also shown that the experimental data are easily predicted by calibrating aerial image simulation results. Finally, a methodology for optimizing SRAF rules using inverse lithography technology is described.

  8. Evaluation of ArF lithography for 45-nm node implant layers

    NASA Astrophysics Data System (ADS)

    Bailey, T. C.; Maynollo, J.; Perez, J. J.; Popova, I.; Zhang, B.

    2007-03-01

    Scaling of designs to the 45nm or future nodes presents challenges for KrF lithography. The purpose of this work was to explore several aspects of ArF lithography for implant layers. A comparison of dark loss seen in a KrF resist and TARC system to that seen in an ArF system showed significant differences. While the KrF resist yielded dark loss that varied with CD and pitch, the ArF resist showed very little dark loss and no significant variation through the design space. ArF resist were observed to have marginal adhesion to various substrates. Improvements in adhesion performance were shown by pre-treating the substrate with various processes, of which an ozone clean provided the best results. Optimization of the HMDS priming conditions also improved adhesion, and it was observed that the HMDS reaction proceeds at different rates on different subsatrates, which is particularly important for implant layers where the resist must adhere to both Si and SiO II. The effect of ArF resist profile with varying reflectivity swing position is shown, and some investigation into reflectivity optimization techniques was performed. Low-index ArF TARC was shown to reduce the CD variation over polysilicon topography, and wet developable BARC was demonstrated to provide consistent profiles on both Si and SiO II substrates. Finally, a comparison of ArF and KrF resists after As implant indicates that the ArF resist showed similar shrinkage performance to the KrF resist.

  9. Double dipole lithography for 65-nm node and beyond: a technology readiness review

    NASA Astrophysics Data System (ADS)

    Hsu, Stephen D.; Eurlings, Mark; Hendrickx, Eric; Van Den Broeke, Douglas J.; Chiou, Tsann-Bim; Chen, J. Fung; Laidig, Thomas L.; Shi, Xuelong; Finders, Jo

    2004-08-01

    Double Dipole Lithography (DDL) has been demonstrated to be capable of imaging complex 2D patterns for full-chip application. Due to inherently high aerial image contrast, we have found that there is strong potential for this technology to meet manufacturing line width roughness (LWR) and critical dimension uniformity (CDU) requirements for the 65nm node using ArF binary chrome masks or 6% attenuated phase shift mask (AttPSM). For patterning at k1 less than 0.35, DDL is a Resolution Enhancement Technology (RET) that offers an acceptable process window without resorting to costly hard phase shift masks. To use DDL for printing actual IC device patterns, the original design data must be converted into "vertical (V)" and "horizontal (H)" masks for the respective X and Y dipole exposures. An improved model-based DDL mask data processing steps has been demonstrated that it is possible to convert complex logic and memory data to X-Y dipole exposure compatible layout. Due to the double exposure, stray light must be well controlled to ensure uniform printing across the entire chip. One solution to minimize stray light is to apply large patches of chrome in open field areas to reduce the background transmission during exposure. Unfortunately, this is not feasible for most poly gate masks using a positive resist process. In this work, we report an improved model based DDL layout conversion methodology for full-chip application. A new generation of DDL technology reticle set was developed to verify the performance. Background light shielding is a critical part of the DDL. We report an innovative shielding scheme to minimize the negative impact of stray light for the critical features during double exposures.

  10. A novel design-based global CDU metrology for 1X nm node logic devices

    NASA Astrophysics Data System (ADS)

    Yoon, Young-Keun; Chung, Dong H.; Kim, Min-Ho; Seo, Jung-Uk; Kim, Byung-Gook; Jeon, Chan-Uk; Hur, JiUk; Cho, Wonil; Yamamoto, Tetsuya

    2013-09-01

    As dimension of device shrinks to 1X nm node, an extreme control of critical dimension uniformity (CDU) of masks becomes one of key techniques for mask and wafer fabrication. For memory devices, a large number of optical techniques have been studied and applied to mask production so far. The advantages of these methods are to eliminate the sampling dependency due to their high throughput, to minimize the local CD errors due to their large field of view (FOV) and to improve the correlation with wafer infield uniformity if they have scanner-like optics. For logic devices, however, CD-SEM has been a single solution to characterize CD performance of logic masks for a long time and simple monitoring patterns, instead of the cell patterns, have been measured to monitor the CD quality of masks. Therefore a global CDU of the mask tends to show its ambiguity because of the limited number of measurement sites and large local CD errors. An application of optical metrology for logic mask is a challenging task because patterns are more complex and random in shape and because there is no guarantee of finding patterns for CDU everywhere on the mask. CDU map still consists of the results from the indirect measurements and the traditional definition of uniformity, a statistical deviation of a typical pattern, seems to be unsuitable for logic CDU. A new definition of CDU is required in order to maximize the coverage area on a mask. In this study, we have focused of the possibility of measuring cell patterns and of using an inspection tool with data base handling capability, KLA Teron617, to find the areas and positions where the repeating patterns exist and the patterns which satisfy a certain set of condition and we have devised a new definition of CDU, which can handle multiple target CDs. Then we have checked the feasibility and validity of our new methodology through evaluation its fundamental performance such as accuracy, repeatability, and correlation with other CD metrology

  11. Data preparation solution for e-beam multiple pass exposure: reaching sub-22nm nodes with a tool dedicated to 45 nm

    NASA Astrophysics Data System (ADS)

    Martin, Luc; Manakli, Serdar; Bayle, Sébastien; Choi, Kang-Hoon; Gutsch, Manuela; Pradelles, Jonathan; Bustos, Jessy

    2011-04-01

    Electron Beam Direct Write (EBDW) lithography is used in the IC manufacturing industry to sustain optical lithography for prototyping applications and low volume manufacturing. It is also used in R&D to develop advanced technologies, ahead of mass production. As microelectronics is now moving towards the 32nm node and beyond, the specifications in terms of dimension control and roughness becomes tighter. In addition, the shrink of the size and pitch of features significantly reduces the process window of lithographic tools. In EBDW, the standard proximity effects corrections only based on dose modulation show difficulties to provide the required Energy Latitude for patterning structures designed below 45nm. A new approach is thus needed to improve the process window of EBDW lithography and push its resolution capabilities. In previous papers, a new writing strategy based on multiple pass exposure has been introduced and optimized to pattern critical dense lines. This new technique consists in adding small electron Resolution Improvement Features (eRIFs) on top of the nominal structures. Then this new design is exposed in two successive passes with optimized doses. Previous studies were led to evaluate this new writing technique and establish rules to optimize the design of the eRIF. Significant improvements have already been demonstrated on SRAM and Logic structures down to the 16nm node. These results were obtained with a tool dedicated to the 45nm node. The next step of this work is thus to automatically implement the eRIF to correct large-scale layouts. In this paper, a new data preparation flow is set up for EBDW lithography. It uses the eRIF solution as a full advanced correction method for critical structures. The specific correction rules established in our previous studies are implemented to improve the CD control and the patterning of corners and line ends. Moreover, the dose and shape of the eRIFs are automatically tuned to best fit the nominal design

  12. DOE experiment for scattering bars optimization at the 90nm node

    NASA Astrophysics Data System (ADS)

    Bouton, G.; Connolly, B.; Courboin, D.; Di Giacomo, A.; Gasnier, F.; Lallement, R.; Parker, D.; Pindo, M.; Richoilley, J. C.; Royere, F.; Rameau-Savio, A.; Tissier, M.

    2011-03-01

    Scattering bars (SB) are sub-resolution lines added to the original database during Resolution Enhancement Techniques (RET) treatments. Their goal is stabilizing the CD of the adjacent polygons (by suppressing or reducing secondary diffraction waves). SB increase the process window in the litho process by lowering the first derivative of the CD. Moreover, the detailed knowledge of SB behavior around the fab working point is a must for future shrinks and for preparing the next technology nodes. SB are inserted in the generation of critical levels for STMicroelectronics 90 nm technology embedded memories before invoking the Model for Optical Proximity Corrections (MBOPC). This allows the software to calculate their contribution to the intensity in the aerial image and integrate their effects in Edge Proximity Error (EPE) corrections. However the Rule-Based insertion of these assist features still leaves behind occurrences of conflicting priorities as in the image below. (See manuscript PDF)Detection of Hot Spots in 2D simulations for die treatment validation (done on BRION equipment on each critical level before mask making) is in most cases correlated with SB singularities, at least for CD non-uniformity, bridging issues and necking in correspondence with OPC fragmentation effects. Within the framework of the MaXSSIMM project, we established a joint STMicroelectronics and Toppan Photomasks team to explore the influence of assist features (CD, distance), convex and concave corner rounding and CD uniformity by means of specific test patterns. The proposed study concerns the algorithms used to define the mask shop input as well as the physical mask etching. A set of test cases, based on elementary test patterns, each one including a list of geometrical variations, has been defined. As the number of configurations becomes rapidly very large (tens of thousands) we had to apply Design of Experiments (DOE) algorithms in order to reduce the number of measurements to a

  13. Multi-Subband Ensemble Monte Carlo simulation of bulk MOSFETs for the 32 nm-node and beyond

    NASA Astrophysics Data System (ADS)

    Sampedro, C.; Gámiz, F.; Godoy, A.; Valín, R.; García-Loureiro, A.; Rodríguez, N.; Tienda-Luna, I. M.; Martinez-Carricondo, F.; Biel, B.

    2011-11-01

    With the 32 nm node in mass production, simulation tools have to include quantum effects to correctly describe the behavior of the devices. The Multi-Subband Ensemble Monte Carlo (MSB-EMC) approach constitutes today's most accurate method for the study of nanodevices with important applications to SOI devices. However, the study of bulk devices with MSB-EMC codes presents practical limitations arising from the device geometry and the existence of a semi-infinite quantum well. This work presents a in-depth study of such issues to properly apply the Multi-Subband approach to bulk devices. The developed simulator has been used to study bulk-nMOSFETs for the 32 nm technological node and beyond which still constitutes the mainstream technology in commercial ICs and to compare them to their SOI counterparts.

  14. Nodes

    NASA Technical Reports Server (NTRS)

    Hanson, John; Martinez, Andres; Petro, Andrew

    2015-01-01

    Nodes is a technology demonstration mission that is scheduled for launch to the International SpaceStation no earlier than Nov.19, 2015. The two Nodes satellites will be deployed from the Station in early 2016 todemonstrate new network capabilities critical to the operation of swarms of spacecraft. They will demonstrate the ability ofmulti spacecraft swarms to receive and distribute ground commands, exchange information periodically, andautonomously configure the network by determining which spacecraft should communicate with the ground each day ofthe mission.

  15. Practical proof of CP element based design for 14nm node and beyond

    NASA Astrophysics Data System (ADS)

    Maruyama, Takashi; Takita, Hiroshi; Ikeno, Rimon; Osawa, Morimi; Kojima, Yoshinori; Sugatani, Shinji; Hoshino, Hiromi; Hino, Toshio; Ito, Masaru; Iizuka, Tetsuya; Komatsu, Satoshi; Ikeda, Makoto; Asada, Kunihiro

    2013-03-01

    To realize HVM (High Volume Manufacturing) with CP (Character Projection) based EBDW, the shot count reduction is the essential key. All device circuits should be composed with predefined character parts and we call this methodology "CP element based design". In our previous work, we presented following three concepts [2]. 1) Memory: We reported the prospects of affordability for the CP-stencil resource. 2) Logic cell: We adopted a multi-cell clustering approach in the physical synthesis. 3) Random interconnect: We proposed an ultra-regular layout scheme using fixed size wiring tiles containing repeated tracks and cutting points at the tile edges. In this paper, we will report the experimental proofs in these methodologies. In full chip layout, CP stencil resource management is critical key. From the MCC-POC (Proof of Concept) result [1], we assumed total available CP stencil resource as 9000um2. We should manage to layout all circuit macros within this restriction. Especially the issues in assignment of CP-stencil resource for the memory macros are the most important as they consume considerable degree of resource because of the various line-ups such as 1RW-, 2RW-SRAMs, Resister Files and ROM which require several varieties of large size peripheral circuits. Furthermore the memory macros typically take large area of more than 40% of die area in the forefront logic LSI products so that the shot count increase impact is serious. To realize CP-stencil resource saving we had constructed automatic CP analyzing system. We developed two types of extraction mode of simple division by block and layout repeatability recognition. By properly controlling these models based upon each peripheral circuit characteristics, we could minimize the consumption of CP stencil resources. The estimation for 14nm technology node had been performed based on the analysis of practical memory compiler. The required resource for memory macro is proved to be affordable value which is 60% of full

  16. Integration of e-beam direct write in BEOL processes of 28nm SRAM technology node using mix and match

    NASA Astrophysics Data System (ADS)

    Gutsch, Manuela; Choi, Kang-Hoon; Hanisch, Norbert; Hohle, Christoph; Seidel, Robert; Steidel, Katja; Thrun, Xaver; Werner, Thomas

    2014-10-01

    Many efforts were spent in the development of EUV technologies, but from a customer point of view EUV is still behind expectations. In parallel since years maskless lithography is included in the ITRS roadmap wherein multi electron beam direct patterning is considered as an alternative or complementary approach for patterning of advanced technology nodes. The process of multi beam exposures can be emulated by single beam technologies available in the field. While variable shape-beam direct writers are already used for niche applications, the integration capability of e-beam direct write at advanced nodes has not been proven, yet. In this study the e-beam lithography was implemented in the BEoL processes of the 28nm SRAM technology. Integrated 300mm wafers with a 28nm back-end of line (BEoL) stack from GLOBALFOUNDRIES, Dresden, were used for the experiments. For the patterning of the Metal layer a Mix and Match concept based on the sequence litho - etch - litho - etch (LELE) was developed and evaluated wherein several exposure fields were blanked out during the optical exposure. E-beam patterning results of BEoL Metal and Via layers are presented using a 50kV VISTEC SB3050DW variable shaped electron beam direct writer at Fraunhofer IPMS-CNT. Etch results are shown and compared to the POR. In summary we demonstrate the integration capability of EBDW into a productive CMOS process flow at the example of the 28nm SRAM technology node.

  17. Applications of AFM in semiconductor R&D and manufacturing at 45 nm technology node and beyond

    NASA Astrophysics Data System (ADS)

    Lee, Moon-Keun; Shin, Minjung; Bao, Tianming; Song, Chul-Gi; Dawson, Dean; Ihm, Dong-Chul; Ukraintsev, Vladimir

    2009-03-01

    Continuing demand for high performance microelectronic products propelled integrated circuit technology into 45 nm node and beyond. The shrinking device feature geometry created unprecedented challenges for dimension metrology in semiconductor manufacturing and research and development. Automated atomic force microscope (AFM) has been used to meet the challenge and characterize narrower lines, trenches and holes at 45nm technology node and beyond. AFM is indispensable metrology techniques capable of non-destructive full three-dimensional imaging, surface morphology characterization and accurate critical dimension (CD) measurements. While all available dimensional metrology techniques approach their limits, AFM continues to provide reliable information for development and control of processes in memory, logic, photomask, image sensor and data storage manufacturing. In this paper we review up-todate applications of automated AFM in every mentioned above semiconductor industry sector. To demonstrate benefits of AFM at 45 nm node and beyond we compare capability of automated AFM with established in-line and off-line metrologies like critical dimension scanning electron microscopy (CDSEM), optical scatterometry (OCD) and transmission electronic microscopy (TEM).

  18. Radio Frequency Performance Improvement with Drain Bias and Limiting Factors of 65-nm-Node Radio Frequency Metal-Oxide-Semiconductor Field-Effect Transistors

    NASA Astrophysics Data System (ADS)

    Kao, Hsuan-ling; Lu, Chia-Ling; Chang, Yung-Cheng

    2009-01-01

    With the continuous down scaling of radio frequency metal-oxide-semiconductor field-effect transistors (RF MOSFETs) into a 65 nm node, the RF performance of unity-gain cutoff frequency ( fT), the maximum frequency of oscillation ( fmax), and the minimum noise figure (NFmin) show much smaller dependences on short-channel effects due to increases in drain current and transconductance (gm), which originate from the short-channel effects. We have studied the effect of drain bias on the RF performance of 65-nm-node MOSFETs. Both the fT and NFmin improve linearly with increasing drain voltage, in contrast with their independence on drain bias in longer-channel devices. Additionally, although fT improves continuously in sub-65-nm node devices, fmax and NFmin deteriorate more in 65-nm-node transistors than in 90-nm-node devices owing to a limiting parasitic effect.

  19. Extending aggressive low-k1 design rule requirements for 90-nm and 65-nm nodes via simultaneous optimization of NA, illumination, and OPC

    NASA Astrophysics Data System (ADS)

    Roy, Sabita; Van Den Broeke, Douglas J.; Chen, J. F.; Liebchen, Armin; Chen, Ting; Hsu, Stephen D.; Shi, Xuelong; Socha, Robert J.

    2004-05-01

    Under low-k1 patterning constraints, it has been a challenge for the lithography process to meet the aggressive IC design rule requirements for the 90nm and the upcoming 65nm nodes. From the imaging perspective, we see the geometric design rules are largely governed by numerical aperture (NA), illumination settings, and OPC for any resolution enhancement technique (RET) applied mask. We report a case study of exploring a set of process feasible design rule criteria based on a state-of-the-art μProcessor chip that contains three different styles of circuit design - standard library cell (SLC), random logic (RML), and SRAM. To keep the packing density higher for SRAM, the critical criteria for design rules involve achievable minimum pitch, sufficient area of contact-landing pad, minimum line end shortening (LES) to ensure poly endcap, and preferably to have optimum pitch for the placement of Scattering Bars (SB). For RML, the goal is to achieve the printing of ever smaller critical dimension (CD) with a greater CD uniformity control. The SLC should be designed to be comparable with both RML and SRAM devices. Hence, the design rule constraints for CD, space, line end, minimum pitch, and SB placement for SLC cell is critically confined. Unlike the traditional method of assuming a linear scaling for the design rule set, we explore achievable design rule criteria for very low k1 imaging by simultaneously optimizing NA, illumination settings, and OPC (for the optimum placement of SB) for a calibrated process. This is done by analyzing the CD control and the maximum overlapped process window for critical lines, spaces, line ends, and with the respective k1 factor for the three types of circuits. For 90nm node with k1 as low as 0.36, a feasible set of design rules for the μProcessor chip can be obtained using 6% attPSM with 6% exposure latitude at 400nm of overlapped depth of focus. Using the similar approach for the scaled down 65nm 6% attPSM, it resulted inadequate

  20. Progress on EUV mask fabrication for 32-nm technology node and beyond

    NASA Astrophysics Data System (ADS)

    Zhang, Guojing; Yan, Pei-Yang; Liang, Ted; Park, Seh-jin; Sanchez, Peter; Shu, Emily Y.; Ultanir, Erdem A.; Henrichs, Sven; Stivers, Alan; Vandentop, Gilroy; Lieberman, Barry; Qu, Ping

    2007-05-01

    Extreme ultraviolet lithography (EUVL) tool development achieved a big milestone last year as two full-field Alpha Demo Tools (ADT) were shipped to customers by ASML. In the future horizon, a full field "EUV1" exposure tool from Nikon will be available by the end of 20071 and the pre-production EUV exposure tools from ASML are targeted for 20092. It is essential that high quality EUVL masks can be made and delivered to the EUVL tool users to support the technology development. In the past year, we have demonstrated mask fabrication with low stress absorber deposition and good etch process control yielding a vertical etch profile and a mask CD control of 5.7 nm for 32 nm (1x) space and 7.4 nm for 32 nm (1x) lines. Mask pattern resolution of 15 nm (1x) dense lines was achieved. Full field reflective mask die-to-die inspection at a 125nm pixel size was demonstrated after low defect multilayer blanks became available. In this paper, we will present details of the Intel EUVL Mask Pilot Line progress in EUVL mask defect reduction, pattern CD performance, program defect mask design and inspection, in-house absorber film development and its performance, and EUVL metrology tool development. We will demonstrate an overall improvement in EUV mask manufacturing readiness due to our Pilot Line activities.

  1. Study and comparison of negative tone resists for fabrication of bright field masks for 14nm node

    NASA Astrophysics Data System (ADS)

    Zweber, Amy E.; Faure, Tom; McGuire, Anne; Sundberg, Linda K.; Sooriyakumaran, Ratnam; Sanchez, Martha I.; Bozano, Luisa D.; Senna, Tasuku; Fujita, Yuki; Negishi, Yoshiyuki; Tanabe, Masahito; Kaneko, Takahiro

    2012-11-01

    In order to meet the challenging patterning requirements of the 14 nm node, the semiconductor industry has implemented use of negative tone develop (NTD) and other tone inversion techniques on wafer to enable use of bright field masks which provide an improved lithography process window.1,2,3 Due to e-beam write time and mask pattern fidelity requirements, the increased use of bright field masks means that mask makers must focus on improving the performance of their negative tone chemically amplified resist (NCAR) processes. In addition, the move to heavy use of bright field masks is introducing new challenges for mask makers. Bright field masks for 14 nm critical layers are required to have opaque sub-resolution assist features (SRAFs) as small as 50 nm while at the same time having across mask critical dimension uniformity (CDU) of less than 2 nm (3 sigma) to meet the 2014 ITRS targets.4 Achieving these specifications is particularly difficult for bright field contact and via level masks. This paper will survey the performance requirements for NCAR resists for building 14 nm critical level masks. As part of this survey, the results of current commercially available and development NCAR resists will be compared. The study will focus on key elements of the resist process pertaining to line edge roughness, pattern fidelity, minimum feature size, and critical dimension control through density with differences in resist type, sensitivity, and thickness. In addition, use of a novel flow cell test apparatus for detailed study of the develop loading performance of the NCAR resists will be described. Data showing the current capability of these NCAR materials as well as remaining 14 nm node performance gaps and issues will be presented.

  2. Process variation challenges and resolution in the negative-tone develop double patterning for 20nm and below technology node

    NASA Astrophysics Data System (ADS)

    Mehta, Sohan S.; Ganta, Lakshmi K.; Chauhan, Vikrant; Wu, Yixu; Singh, Sunil; Ann, Chia; Subramany, Lokesh; Higgins, Craig; Erenturk, Burcin; Srivastava, Ravi; Singh, Paramjit; Koh, Hui Peng; Cho, David

    2015-03-01

    Immersion based 20nm technology node and below becoming very challenging to chip designers, process and integration due to multiple patterning to integrate one design layer . Negative tone development (NTD) processes have been well accepted by industry experts for enabling technologies 20 nm and below. 193i double patterning is the technology solution for pitch down to 80 nm. This imposes tight control in critical dimension(CD) variation in double patterning where design patterns are decomposed in two different masks such as in litho-etch-litho etch (LELE). CD bimodality has been widely studied in LELE double patterning. A portion of CD tolerance budget is significantly consumed by variations in CD in double patterning. The objective of this work is to study the process variation challenges and resolution in the Negative Tone Develop Process for 20 nm and Below Technology Node. This paper describes the effect of dose slope on CD variation in negative tone develop LELE process. This effect becomes even more challenging with standalone NTD developer process due to q-time driven CD variation. We studied impact of different stacks with combination of binary and attenuated phase shift mask and estimated dose slope contribution individually from stack and mask type. Mask 3D simulation was carried out to understand theoretical aspect. In order to meet the minimum insulator requirement for the worst case on wafer the overlay and critical dimension uniformity (CDU) budget margins have slimmed. Besides the litho process and tool control using enhanced metrology feedback, the variation control has other dependencies too. Color balancing between the two masks in LELE is helpful in countering effects such as iso-dense bias, and pattern shifting. Dummy insertion and the improved decomposition techniques [2] using multiple lower priority constraints can help to a great extent. Innovative color aware routing techniques [3] can also help with achieving more uniform density and

  3. Impact of EUV patterning scenario on different design styles and their ground rules for 7nm/5nm node BEOL layers

    NASA Astrophysics Data System (ADS)

    Chiou, Tsann-Bim; Chen, Alek C.; Dusa, Mircea; Tseng, Shih-En

    2016-03-01

    As the IC industry moves forward to 7nm or 5nm node, the minimum pitch of back-end-of-line (BEOL) layers could be near 30nm. Extreme ultraviolet (EUV) could be the most cost effective solution for patterning critical metal and via layers. Patterning of the critical layers would need greater than 4x exposures using ArFi lithography, leading to severe cost and yield issues. There are two potential design options, one-dimension (1D) and two-dimension (2D), for metal 1 layer. EUV's single exposure option offers superior image quality especially for the 2D design style, but scalability of a 2D design is limited by EUV with a fixed numerical aperture (NA). The single exposure of EUV is an appropriate patterning solution for printing a 1D design directly, but maintaining critical dimension uniformity (CDU) of lines and line-ends is a challenge. Scalability of the 1D design is also limited by the single exposure option. The 1D design can be patterned through a spacer film deposition to gain superior line CD control, followed by printing a cut or block pattern to create the line-ends. Since the minimum pitch of cut/block patterns is generally larger than the metal pitch, EUV's single exposure option has a potential to print the cut/block pattern at smaller pitch and resolution and offers an opportunity to further design shrink. An elongated via design helps design scalability due to an insensitive overlay error contribution to via-to-metal contact area and encroachment.

  4. Design verification for sub-70-nm DRAM nodes via metal fix using E-beam direct write

    NASA Astrophysics Data System (ADS)

    Keil, K.; Jaschinsky, P.; Hohle, C.; Choi, K.-H.; Schneider, R.; Tesauro, M.; Thrum, F.; Zimmermann, R.; Kretz, J.

    2009-01-01

    Because of mask cost reduction, electron beam direct write (EBDW) is implemented for special applications such as rapid prototyping or small volume production in semiconductor industry. One of the most promising applications for EBDW is design verification by means of metal fix. Due to write time constrains, Mix & Match solutions have to be developed at smaller nodes. This study reports on several Mix and Match processes for the integration of E-Beam lithography into the optical litho process flow of Qimonda's 70 nm and 58 nm DRAM nodes. Different metal layers have been patterned in part with DUV litho followed by E-Beam litho using a 50 kV Vistec SB3050 shaped electron beam direct writer. All hardmask patterns were then simultaneously transferred into the DRAM stack. After full chip processing a yield study comprising electrical device characterization and defect investigation was performed. We show detailed results including CD and OVL as well as improvements of the alignment mark recognition. The yield of the E-Beam processed chips was found to be within the range of wafer-to-wafer fluctuation of the POR hardware. We also report on metal fix by electrical cutting of selected diodes in large chip scales which usually cannot be accessed with FIB methods. In summary, we show the capability of EBDW for quick and flexible design verification.

  5. DUV water immersion technology extends linearity: first results from the new 65nm node CD metrology system LWM500 WI

    NASA Astrophysics Data System (ADS)

    Hillmann, Frank; Dobereiner, Stefan; Gittinger, Christian; Reiter, Richard; Falk, Gunther; Bruck, Hans-Jurgen; Scheuring, Gerd; Bosser, Artur; Heiden, Michael; Hoppen, Gerhard; Sulik, Wolfgang; Vollrath, Wolfgang

    2005-06-01

    The increased requirements on reticles for the 65nm technology node with respect to CD homogeneity and CD mean to target requirements call for a metrology system with adequate measurement performance. We report on the new water immersion technique and the system concept of the worlds first optical CD metrology system based on this technology. The core of it is a new DUV immersion objective with a NA of 1.2, using illumination at a wavelength of 248nm. The largest challenge of the water immersion technology was the fluid handling. The key compo-nents, a water injection and removal unit, developed by MueTec, solve this issue. To avoid contaminations the purified DI water is micro-filtered. An environmental chamber guarantees extremely stable measurement conditions. The advantages of optical CD measurements in transmitted light compared to CD-SEM is shown. With this system, already installed, excellent results for short- and longterm repeatability for both linewidth and contact measurements were achieved on COG, KrF HT and ArF HT masks. The linearity range of the system is extended down to 220nm. A comparison of CD measurements between the different tool generations such as the Leica LWM250/270 DUV at 248nm with a NA of 0.9 is shown. An outlook on the future potentials of optical mask CD metrology finalises this report.

  6. Lithography options for the 32nm half pitch node and their implications on resist and material technology

    NASA Astrophysics Data System (ADS)

    Gronheid, Roel; Hendrickx, Eric; Wiaux, Vincent; Maenhoudt, Mireille; Goethals, Mieke; Vandenberghe, Geert; Ronse, Kurt

    2008-03-01

    There still remain three major technological lithography options for high volume manufacturing at the 32nm half pitch node: 193nm immersion lithography with high index materials, enabling NA>1.6 193nm double patterning and EUV lithography. In this paper the pros and cons of these three options will be discussed. Particular interest will be paid to the consequences of the final choice on the resist technology. High index 193nm immersion lithography also requires high index resist materials, which are under development but still far removed from the target refractive index and absorbance specifications not to mention lithographical performance. For double patterning the pitch may be relaxed, but the resists still need to be able to print very narrow lines and/or trenches. Moreover, it would be preferred for the resists to support pattern or image freezing techniques in order to step away from the litho-etch-litho-etch approach and make double patterning more cost effective. For EUV the resist materials need to meet very aggressive sensitivity specifications. In itself this is possible, but it is difficult to simultaneously maintain performance in terms of resolution and line width roughness. A new parameter (K LUP) for assessing resist performance in terms of these three performance criteria will be introduced.

  7. Advanced gate CDU control in sub-28nm node using poly slot process by scatterometry metrology

    NASA Astrophysics Data System (ADS)

    Tzai, Wei-Jhe; Chen, Howard; Lin, Jun-Jin; Huang, Yu-Hao; Yu, Chun-Chi; Lin, Ching-Hung Bert; Yoo, Sungchul; Huang, Chien-Jen Eros; Mihardja, Lanny

    2013-04-01

    Scatterometry-based metrology is a well proven method to measure and monitor the critical dimensions of interest in advanced sub-28nm process development and high volume manufacturing [1][3][4][6][7]. In this paper, a proposed solution to control and achieve the optimal gate critical dimension uniformity (CDU) was explored. The proposed solution is named a novel scatterometry slot gate CDU control flow. High performance measurement and control during the slot gate step is critical as it directly controls the poly line cut profile to the active area which then directly impacts the final device performance. The proposed flow incorporates scatterometry-based CD (SCD) measurement feedback and feed forward to the Automation Process Control (APC) system, further process recipe fine tuning utilizing the data feedback and forward, and two dimensional (2D) and three dimensional (3D) scatterometry-based CD (SCD) measurement of gate after developer inspection (ADI) and after etch inspection (AEI) [1]. The methodologies and experiment results presented in this study started from the process development through the SCD model optimization of the DOE wafers, to the final implementation of the process control flow and measurement loop into the production line to evaluate its capability for long term in-line monitoring in high volume manufacturing environment. The result showed significant improvement in the gate CD uniformity that met the sub-28nm process manufacturing requirement.

  8. Hyper-NA imaging of 45nm node random CH layouts using inverse lithography

    NASA Astrophysics Data System (ADS)

    Hendrickx, E.; Tritchkov, A.; Sakajiri, K.; Granik, Y.; Kempsell, M.; Vandenberghe, G.

    2008-03-01

    The imaging of Contact Hole (CH) layouts is one of the most challenging tasks in hyper-NA lithography. Contact Hole layouts can be printed using different illumination conditions, but an illumination condition that provides good imaging at dense pitches (such as Quasar or Quadrupole illumination), will usually suffer from poor image contrast and Depth of Focus (DOF) towards the more isolated pitches. Assist Features (AF) can be used to improve the imaging of more isolated contact holes, but for a random CH layout, an AF placement rule would have to be developed for every CH configuration in the design. This makes optimal AF placement an almost impossible task for random layouts when using rule-based AF placement. We have used an inverse lithography technique by Mentor Graphics, to treat a random contact hole layout (drawn at minimal pitch 115nm) for imaging at NA 1.35. The combination of the dense 115nm pitch and available NA of 1.35 makes the use of Quasar illumination necessary, and the treatment of the clip with inverse lithography automatically generated optimal (model-based) AF for all geometries in the design. Because the inverse lithography solution consists of smooth shapes rather than rectangles, mask manufacturability becomes a concern. The algorithm allows simplification of the smooth shapes into rectangles and greatly improves mask write time. Wafer prints of clips treated with inverse lithography at NA 1.35 confirm the benefit of the assist features.

  9. The cleaning effects of mask aerial image after FIB repair in sub-80nm node

    NASA Astrophysics Data System (ADS)

    Lee, Hyemi; Jeong, Goomin; Jeong, Sookyeong; Kim, Sangchul; Han, Oscar

    2007-10-01

    The Aerial Image Measurement Tool (AIMS) can estimate the wafer printability without exposure to wafer by using scanner. Since measured aerial images are similar with wafer prints, using AIMS becomes normal for verifying issue points of a mask. Also because mask design rule continues to shrink, defects and CD uniformity are at issues as factors decreasing mask yield. Occurred defects on a mask are removed by existing mask repair techniques such as nanomachining, electron beam and focused ion beam. But damages and contaminants by chemical and physical action are found on the mask surface and contaminants above special size lead to defects on a wafer. So cleaning has been necessary after repair process and detergency has been important. Before AIMS measurement, cleaning is done to make same condition with shipped mask, which method brings repeated process - repair and cleaning - if aerial image was not usual. So cleaning effect after the FIB repair is tested by using the AIMS to find the optimized process minimizing the repeated process and to get similar scanner results. First, programmed defect mask that includes various defect size and type is manufactured on some kinds of patterns in DRAM device and sub-80nm tech. Next the defects on the programmed mask are repaired by FIB repair machine. And aerial images are compared after the chemical cleaning, non-chemical cleaning and without cleaning. Finally, approximate aerial images to scanner results are taken regardless of cleaning process. It means that residue originated from repair process doesn't affect aerial images and flexible process is possible between AIMS, repair and cleaning process. But as the effect of minute particles and contaminations will be increased if pattern size is much smaller, it needs to reconfirm the effect below the sub-60nm in DRAM device.

  10. 90nm node contact hole patterning through applying model based OPC in KrF lithography

    NASA Astrophysics Data System (ADS)

    Jeon, Young-Doo; Lee, Sang-Uk; Choi, Jaeyoung; Kim, Jeahee; Han, Jaewon

    2008-03-01

    As semiconductor technologies move toward 90nm generation and below, contact hole is one of the most challenging features to print in the semiconductor manufacturing process. There are two principal difficulties in order to define small contact hole pattern on wafer. One is insufficient process margin besides poor resolution compared with line & space pattern. The other is that contact hole should be made through pitches and sometimes random contact hole pattern should be fabricated. Therefore advanced ArF lithography scanner should be used for small contact hole printing with RETs (Resolution Enhancement Techniques) such as immersion lithography, OPC(Optical Proximity Correction), PSM(Phase Shift Mask), high NA(Numerical Aperture), OAI(Off-Axis Illumination), SRAF(Sub-resolution Assistant Feature), mask biasing and thermal flow. Like this, ArF lithography propose the method of enhancing resolution, however, we must spend an enormous amount of CoC(cost of ownership) to utilize ArF photolithography process than KrF. In this paper, we suggest the method of contact holes patterning by using KrF lithography tool in 90nm sFlash(stand alone Flash)devices. For patterning of contact hole, we apply RETs which combine OAI and Model based OPC. Additionally, in this paper we present the result of hole pattern images which operate ArF lithography equipment. Also, this study describes comparison of two wafer images that ArF lithography process which is used mask biasing and Rule based OPC, KrF lithography process which is applied hybrid OPC.

  11. Results of benchmarking of advanced CD-SEMs at the 90-nm CMOS technology node

    NASA Astrophysics Data System (ADS)

    Bunday, Benjamin D.; Bishop, Michael; Allgair, John A.

    2004-05-01

    The Advanced Metrology Advisory Group (AMAG) is a council composed of the chief CD-metrologists from the International SEMATECH Manufacturing Initiative (ISMI) consortium"s Member Companies and from the National Institute of Standards (NIST). The AMAG wrote and, in 2002, with CD-SEM supplier involvement, updated the "Unified Advanced CD-SEM Specification for Sub-130nm Technology (Version 2002)" to be a living document which outlines the required performance of advanced CD-SEMs for supplier compliance to the 2003 International Technology Roadmap for Semiconductors, and also conveys member companies" other collective needs to vendors. Through applying this specification during the mid-2003 timeframe, a benchmarking effort of the currently available advanced CD-SEMs has been performed. These results are presented here. The AMAG Unified Specification includes sections outlining the test methodologies, metrics, and wafer-target requirements for each parameter included in the benchmark, and, when applicable, prescribes a target specification compatible with the ITRS and methodologies compatible with the demands of 90nm technology. Parameters to be considered include: ×Precision, Repeatability and Reproducibility ×Accuracy, Apparent Beam Width and Resolution ×Charging and Contamination ×Tool-to-Tool Matching ×Pattern Recognition and Navigation Accuracy ×Throughput ×Instrumentation Outputs ×Tool Automation and Utility ×Precision and Accuracy of Profile Measurement ×Precision and Accuracy of Roughness Measurement. Previous studies under this same project have been published, with the initial version of the International Sematech Unified Specification in 1998, and multi-supplier benchmarks in 1999 and 2001. The results for the 2003 benchmark will be shown and compared to the ITRS, and composite viewpoints showing these 2003 benchmark results compared to the past results are also shown, demonstrating interesting CD-SEM industry trends.

  12. Particle control challenges in process chemicals and ultra-pure water for sub-10nm technology nodes

    NASA Astrophysics Data System (ADS)

    Rastegar, Abbas; Samayoa, Martin; House, Matthew; Kurtuldu, Hüseyin; Eah, Sang-Kee; Morse, Lauren; Harris-Jones, Jenah

    2014-04-01

    Particle contamination in ultra-pure water (UPW) and chemicals will eventually end up on the surface of a wafer and may result in killer defects. To improve the semiconductor processing yield in sub-10 nm half pitch nodes, it is necessary to control particle defectivity. In a systematic study of all major techniques for particle detection, counting, and sizing in solutions, we have shown that there is a gap in the required particle metrology which needs to be addressed by the industry. To reduce particles in solutions and improve filter retention for sub-10 nm particles with very low densities (<10 particles/mL), liquid particle counters that are able to detect small particles at low densities are required. Non-volatile residues in chemicals and UPW can result in nanoparticles. Measuring absolute non-volatile residues in UPW with concentrations in the ppb range is a challenge. However, by using energy-dispersive spectroscopy (EDS) analysis through transmission electron microscopy (TEM) of non-volatile residues we found silica both in dissolved and colloidal particle form which is present in one of the cleanest UPW that we tested. A particle capture/release technique was developed at SEMATECH which is able to collect particles from UPW and release them in a controlled manner. Using this system we showed sub-10 nm particles are present in UPW. In addition to colloidal silica, agglomerated carbon containing particles were also found in UPW.

  13. Materials and fabrication sequences for water soluble silicon integrated circuits at the 90 nm node

    SciTech Connect

    Yin, Lan; Harburg, Daniel V.; Rogers, John A.; Bozler, Carl; Omenetto, Fiorenzo

    2015-01-05

    Tungsten interconnects in silicon integrated circuits built at the 90 nm node with releasable configurations on silicon on insulator wafers serve as the basis for advanced forms of water-soluble electronics. These physically transient systems have potential uses in applications that range from temporary biomedical implants to zero-waste environmental sensors. Systematic experimental studies and modeling efforts reveal essential aspects of electrical performance in field effect transistors and complementary ring oscillators with as many as 499 stages. Accelerated tests reveal timescales for dissolution of the various constituent materials, including tungsten, silicon, and silicon dioxide. The results demonstrate that silicon complementary metal-oxide-semiconductor circuits formed with tungsten interconnects in foundry-compatible fabrication processes can serve as a path to high performance, mass-produced transient electronic systems.

  14. Applications of X-Ray Reflectometry to Develop and Monitor FEOL Processes for sub-45nm Technology Nodes

    SciTech Connect

    Nolot, E.; Bogumilowicz, Y.; Danel, A.; Lhostis, S.

    2007-09-26

    Fast X-Ray Reflectometry is a powerful technique for the analysis of FEOL processes for sub-45 nm technology nodes since it can determine the density, the thickness and the roughness of extremely thin layers and stacks. It helps to explore and identify high-k gate dielectrics and metal gate electrodes that enable the fabrication of optimized gate stack. Moreover, XRR is an attractive alternative to spectroscopic ellipsometry to determine the thickness and the physical properties of starting materials that either improve heat dissipation properties or improve mobility in transistor channels: silicon-on-insulator with insulator being a material of higher thermal conductivity than SiO{sub 2} or strained silicon, respectively.

  15. OPC model data collection for 45-nm technology node using automatic CD-SEM offline recipe creation

    NASA Astrophysics Data System (ADS)

    Fischer, Daniel; Talbi, Mohamed; Wei, Alex; Menadeva, Ovadya; Cornell, Roger

    2007-03-01

    Optical and Process Correction in the 45nm node is requiring an ever higher level of characterization. The greater complexity drives a need for automation of the metrology process allowing more efficient, accurate and effective use of the engineering resources and metrology tool time in the fab, helping to satisfy what seems an insatiable appetite for data by lithographers and modelers charged with development of 45nm and 32nm processes. The scope of the work referenced here is a 45nm design cycle "full-loop automation", starting with gds formatted target design layout and ending with the necessary feedback of one and two dimensional printed wafer metrology. In this paper the authors consider the key elements of software, algorithmic framework and Critical Dimension Scanning Electron Microscope (CDSEM) functionality necessary to automate its recipe creation. We evaluate specific problems with the methodology of the former art, "on-tool on-wafer" recipe construction, and discuss how the implementation of the design based recipe generation improves upon the overall metrology process. Individual target-by-target construction, use of a one pattern recognition template fits all approach, a blind navigation to the desired measurement feature, lengthy sessions on tool to construct recipes and limited ability to determine measurement quality in the resultant data set are each discussed as to how the state of the art Design Based Metrology (DBM) approach is implemented. The offline created recipes have shown pattern recognition success rates of up to 100% and measurement success rates of up to 93% for line/space as well as for 2D Minimum/Maximum measurements without manual assists during measurement.

  16. Study of alternative capping and absorber layers for extreme ultraviolet (EUV) masks for sub-16nm half-pitch nodes

    NASA Astrophysics Data System (ADS)

    Rastegar, Abbas; House, Matthew; Tian, Ruahi; Laursen, Thomas; Antohe, Alin; Kearney, Patrick

    2014-04-01

    Multiple challenges, including the availability of a reliable high power source, defect free mask, and proper resist material, have forced extreme ultraviolet (EUV) lithography to be considered for sub-10 nm half-pitch nodes. Therefore, techniques such as phase shift masks (PSMs) or high numerical aperture (NA) lithography might be considered. Such techniques require thin EUV absorber materials to be optimized to reduce EUV mask shadowing effects. Despite the challenges in dry etching of Ni and finding proper chemistries with a high etch selectivity to suitable capping materials, we decided to examine the chemical stability of Ni for existing mask cleaning chemistries. Ni, after Ag, has the highest absorption in EUV light at λ = 13.5 nm, which makes it a proper candidate—in pure form or in mixing with other elements—for thin absorber film. Depending on the composition of the final material, proper integration schemes will be developed. We studied Ni stability in commonly used mask cleaning processes based on ammonium hydroxide/ hydrogen peroxide (APM) and water mixtures. Ni films deposited with an ion beam deposition technique with a thickness of 35 nm are sufficient to totally absorb EUV light at λ = 13.5 nm. Multiple cleanings of these Ni films resulted in Ni oxidation— confirmed by time-of-flight secondary ion mass spectroscopy (TOF-SIMS) analysis as NiO with thickness about 1.5 nm. Furthermore, Ni oxidation processes are self-limiting and oxide layer thickness did not increase with a further cleaning. A three minute exposure to sulfuric acid/hydrogen peroxide mixture (SPM) can remove NiO and Ni totally. To protect Ni film from etching by SPM chemistry a 3 nm Si capping was used on top of Ni film. However, Si capping was removed by APM chemistry and could not protect Ni film against SPM chemistry. TiO2 may be a very good capping layer for EUV optics but it is not suitable for EUV mask blanks and will be removed by APM chemistries.

  17. Complete data preparation flow for Massively Parallel E-Beam lithography on 28nm node full-field design

    NASA Astrophysics Data System (ADS)

    Fay, Aurélien; Browning, Clyde; Brandt, Pieter; Chartoire, Jacky; Bérard-Bergery, Sébastien; Hazart, Jérôme; Chagoya, Alexandre; Postnikov, Sergei; Saib, Mohamed; Lattard, Ludovic; Schavione, Patrick

    2016-03-01

    Massively parallel mask-less electron beam lithography (MP-EBL) offers a large intrinsic flexibility at a low cost of ownership in comparison to conventional optical lithography tools. This attractive direct-write technique needs a dedicated data preparation flow to correct both electronic and resist processes. Moreover, Data Prep has to be completed in a short enough time to preserve the flexibility advantage of MP-EBL. While the MP-EBL tools have currently entered an advanced stage of development, this paper will focus on the data preparation side of the work for specifically the MAPPER Lithography FLX-1200 tool [1]-[4], using the ASELTA Nanographics Inscale software. The complete flow as well as the methodology used to achieve a full-field layout data preparation, within an acceptable cycle time, will be presented. Layout used for Data Prep evaluation was one of a 28 nm technology node Metal1 chip with a field size of 26x33mm2, compatible with typical stepper/scanner field sizes and wafer stepping plans. Proximity Effect Correction (PEC) was applied to the entire field, which was then exported as a single file to MAPPER Lithography's machine format, containing fractured shapes and dose assignments. The Soft Edge beam to beam stitching method was employed in the specific overlap regions defined by the machine format as well. In addition to PEC, verification of the correction was included as part of the overall data preparation cycle time. This verification step was executed on the machine file format to ensure pattern fidelity and accuracy as late in the flow as possible. Verification over the full chip, involving billions of evaluation points, is performed both at nominal conditions and at Process Window corners in order to ensure proper exposure and process latitude. The complete MP-EBL data preparation flow was demonstrated for a 28 nm node Metal1 layout in 37 hours. The final verification step shows that the Edge Placement Error (EPE) is kept below 2.25 nm

  18. Shot number analysis on character projection e-beam lithography for random logic device fabrication at 70-nm node

    NASA Astrophysics Data System (ADS)

    Tomo, Yoichi; Shimizu, Isao; Kojima, Yoshinori; Yoshida, Akira; Takenaka, Hiroshi; Yamabe, Masaki

    2001-08-01

    A reduction efficiency of shot numbers in character projection (CP) electron-beam (EB) lithography with memory device application depends on a design rule (cell size) and a pattern complexity within a memory cell. Many researchers reported that it was approximately 1/10 to 1/100 compared with conventional variable-shaped beam (VSB) method. The reduction of shot numbers in memory devices mainly comes from allowance to place multiple cells in one CP-cell area and simplicity of the cell's placement (regular pitch with adjacent allocation). On the other hand, there are few reports concerning reduction efficiency of shot numbers with logic specific application in CP EB lithography due to the complexity of logic cell's allocation to CP-cell area. To analyze this, logic device layout data in 70nm node was prepared by shringking actual functional device data of 350 nm node in the ratio of 1/5 and extracting random logic region. The size of this region was 1,094 x 283 micrometers . The height of logic cell was 2.64micrometers and it was smaller than typical one CP-cell size in second aperture (5 x 5micrometers ). The pattern data in GDS-II stream format was converted into EB exposure data: divided figures (rectangles). By this procedure, numbers of figures and cells were obtained. The total number of referred logic cell was 26,812. Among 26,812 cells, only 111 common (unique) logic cells were used for the logic region. The sum of figures in gate layer was 412,251 and this value was assumed to be equal to a total number of shots in conventional VSB method. Among the 111 common cells, only 6 cells in the gate layer showed width more than 5micrometers (maximum CP-cell size). Most frequently referred cell was an inverter and the number of reference was 5,395. The referred frequency of each cell exponentially decreased when the cells were arranged in descending order of reference. Among the total figures, top cell showed 66,120 accumulated number of figures (referred number=2

  19. Patterning process exploration of metal 1 layer in 7nm node with 3D patterning flow simulations

    NASA Astrophysics Data System (ADS)

    Gao, Weimin; Ciofi, Ivan; Saad, Yves; Matagne, Philippe; Bachmann, Michael; Oulmane, Mohamed; Gillijns, Werner; Lucas, Kevin; Demmerle, Wolfgang; Schmoeller, Thomas

    2015-03-01

    In 7mn node (N7), the logic design requires the critical poly pitch (CPP) of 42-45nm and metal 1 (M1) pitch of 28- 32nm. Such high pattern density pushes the 193 immersion lithography solution toward its limit and also brings extremely complex patterning scenarios. The N7 M1 layer may require a self-aligned quadruple patterning (SAQP) with triple litho-etch (LE3) block process. Therefore, the whole patterning process flow requires multiple exposure+etch+deposition processes and each step introduces a particular impact on the pattern profiles and the topography. In this study, we have successfully integrated a simulation tool that enables emulation of the whole patterning flow with realistic process-dependent 3D profile and topology. We use this tool to study the patterning process variations of N7 M1 layer including the overlay control, the critical dimension uniformity (CDU) budget and the lithographic process window (PW). The resulting 3D pattern structure can be used to optimize the process flow, verify design rules, extract parasitics, and most importantly, simulate the electric field and identify hot spots for dielectric reliability. As an example application, we will report extractions of maximum electric field at M1 tipto- tip which is one of the most critical patterning locations and we will demonstrate the potential of this approach for investigating the impact of process variations on dielectric reliability. We will also present simulations of an alternative M1 patterning flow, with a single exposure block using extreme ultraviolet lithography (EUVL) and analyze its advantages compared to the LE3 block approach.

  20. Hybrid Metrology and 3D-AFM Enhancement for CD Metrology Dedicated to 28 nm Node and Below Requirements

    SciTech Connect

    Foucher, J.; Faurie, P.; Dourthe, L.

    2011-11-10

    The measurement accuracy is becoming one of the major components that have to be controlled in order to guarantee sufficient production yield. Already at the R and D level, we have to come up with the accurate measurements of sub-40 nm dense trenches and contact holes coming from 193 immersion lithography or E-Beam lithography. Current production CD (Critical Dimension) metrology techniques such as CD-SEM (CD-Scanning Electron Microscope) and OCD (Optical Critical Dimension) are limited in relative accuracy for various reasons (i.e electron proximity effect, outputs parameters correlation, stack influence, electron interaction with materials...). Therefore, time for R and D is increasing, process windows degrade and finally production yield can decrease because you cannot manufactured correctly if you are unable to measure correctly. A new high volume manufacturing (HVM) CD metrology solution has to be found in order to improve the relative accuracy of production environment otherwise current CD Metrology solution will very soon get out of steam.In this paper, we will present a potential Hybrid CD metrology solution that smartly tuned 3D-AFM (3D-Atomic Force Microscope) and CD-SEM data in order to add accuracy both in R and D and production. The final goal for 'chip makers' is to improve yield and save R and D and production costs through real-time feedback loop implement on CD metrology routines. Such solution can be implemented and extended to any kind of CD metrology solution. In a 2{sup nd} part we will discuss and present results regarding a new AFM3D probes breakthrough with the introduction of full carbon tips made will E-Beam Deposition process. The goal is to overcome the current limitations of conventional flared silicon tips which are definitely not suitable for sub-32 nm nodes production.

  1. Hybrid Metrology & 3D-AFM Enhancement for CD Metrology Dedicated to 28 nm Node and Below Requirements

    NASA Astrophysics Data System (ADS)

    Foucher, J.; Faurie, P.; Dourthe, L.; Irmer, B.; Penzkofer, C.

    2011-11-01

    The measurement accuracy is becoming one of the major components that have to be controlled in order to guarantee sufficient production yield. Already at the R&D level, we have to come up with the accurate measurements of sub-40 nm dense trenches and contact holes coming from 193 immersion lithography or E-Beam lithography. Current production CD (Critical Dimension) metrology techniques such as CD-SEM (CD-Scanning Electron Microscope) and OCD (Optical Critical Dimension) are limited in relative accuracy for various reasons (i.e electron proximity effect, outputs parameters correlation, stack influence, electron interaction with materials…). Therefore, time for R&D is increasing, process windows degrade and finally production yield can decrease because you cannot manufactured correctly if you are unable to measure correctly. A new high volume manufacturing (HVM) CD metrology solution has to be found in order to improve the relative accuracy of production environment otherwise current CD Metrology solution will very soon get out of steam. In this paper, we will present a potential Hybrid CD metrology solution that smartly tuned 3D-AFM (3D-Atomic Force Microscope) and CD-SEM data in order to add accuracy both in R&D and production. The final goal for "chip makers" is to improve yield and save R&D and production costs through real-time feedback loop implement on CD metrology routines. Such solution can be implemented and extended to any kind of CD metrology solution. In a 2nd part we will discuss and present results regarding a new AFM3D probes breakthrough with the introduction of full carbon tips made will E-Beam Deposition process. The goal is to overcome the current limitations of conventional flared silicon tips which are definitely not suitable for sub-32 nm nodes production.

  2. Integration of highly-strained SiGe materials in 14 nm and beyond nodes FinFET technology

    NASA Astrophysics Data System (ADS)

    Wang, Guilei; Abedin, Ahmad; Moeen, Mahdi; Kolahdouz, Mohammadreza; Luo, Jun; Guo, Yiluan; Chen, Tao; Yin, Huaxiang; Zhu, Huilong; Li, Junfeng; Zhao, Chao; Radamson, Henry H.

    2015-01-01

    SiGe has been widely used as stressors in source/drain (S/D) regions of Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET) to enhance the channel mobility. In this study, selectively grown Si1-xGex (0.33 ⩽ x ⩽ 0.35) with boron concentration of 1 × 1020 cm-3 was used to elevate the S/D regions on bulk FinFETs in 14 nm technology node. The epitaxial quality of SiGe layers, SiGe profile and the strain amount of the SiGe layers were investigated. In order to in-situ clean the Si-fins before SiGe epitaxy, a series of prebaking experiments at temperature ranging from 740 to 825 °C were performed. The results showed that the thermal budget needs to be limited to 780-800 °C in order to avoid any damage to the shape of Si-fins but to remove the native oxide which is essential for high epitaxial quality. In this study, a kinetic gas model was also applied to predict the SiGe growth profile on Si-fins with trapezoidal shape. The input parameters for the model include growth temperature, partial pressures of reactant gases and the chip layout. By knowing the epitaxial profile, the strain to the Si-fins exerted by SiGe layers can be calculated. This is important in understanding the carrier transport in the FinFETs. The other benefit of the modeling is that it provides a cost-effective alternative for epitaxy process development as the SiGe profile can be readily predicted for any chip layout in advance.

  3. 3D mask modeling with oblique incidence and mask corner rounding effects for the 32nm node

    NASA Astrophysics Data System (ADS)

    Saied, Mazen; Foussadier, Franck; Belledent, Jérôme; Trouiller, Yorick; Schanen, Isabelle; Yesilada, Emek; Gardin, Christian; Urbani, Jean Christophe; Sundermann, Frank; Robert, Frédéric; Couderc, Christophe; Vautrin, Florent; LeCam, Laurent; Kerrien, Gurwan; Planchot, Jonathan; Martinelli, Catherine; Wilkinson, Bill; Rody, Yves; Borjon, Amandine; Morgana, Nicolo; Di-Maria, Jean-Luc; Farys, Vincent

    2007-10-01

    The perpetual shrinking in critical dimensions in semiconductor devices is driving the need for increased resolution in optical lithography. Increasing NA to gain resolution also increases Optical Proximity Correction (OPC) model complexity. Some optical effects which have been completely neglected in OPC modeling become important. Over the past few years, off-axis illumination has been widely used to improve the imaging process. OPC models which utilize such illumination still use the thin film mask approximation (Kirchhoff approach), during optical model generation, which utilizes a normal incidence. However, simulating a three dimensional mask near-field using an off-axis illumination requires OPC models to introduce oblique incidence. In addition, the use of higher NA systems introduces high obliquity field components that can no longer be assimilated as normal incident waves. The introduction of oblique incidence requires other effects, such as corner rounding of mask features, to be considered, that are seldom taken into account in OPC modeling. In this paper, the effects of oblique incidence and corner rounding of mask features on resist contours of 2D structures (i.e. line-ends and corners) are studied. Rigorous electromagnetic simulations are performed to investigate the scattering properties of various lithographic 32nm node mask structures. Simulations are conducted using a three dimensional phase shift mask topology and an off-axis illumination at high NA. Aerial images are calculated and compared with those obtained from a classical normal incidence illumination. The benefits of using an oblique incidence to improve hot-spot prediction will be discussed.

  4. Improvement of optical proximity-effect correction model accuracy by hybrid optical proximity-effect correction modeling and shrink correction technique for 10-nm node process

    NASA Astrophysics Data System (ADS)

    Hitomi, Keiichiro; Halle, Scott; Miller, Marshal; Graur, Ioana; Saulnier, Nicole; Dunn, Derren; Okai, Nobuhiro; Hotta, Shoji; Yamaguchi, Atuko; Komuro, Hitoshi; Ishimoto, Toru; Koshihara, Shunsuke; Hojo, Yutaka

    2016-07-01

    The model accuracy of optical proximity-effect correction (OPC) was investigated by two modeling methods for a 10-nm node process. The first method is to use contours of two-dimensional structures extracted from critical dimension-scanning electron microscope (CD-SEM) images combined with conventional CDs of one-dimensional structures. The accuracy of this hybrid OPC model was compared with that of a conventional OPC model, which was created with only CD data, in terms of root-mean-square (RMS) error for metal and contact layers of 10-nm node logic devices. Results showed improvement of model accuracy with the use of hybrid OPC modeling by 23% for contact layer and 18% for metal layer, respectively. The second method is to apply a correction technique for resist shrinkage caused by CD-SEM measurement to extracted contours for improving OPC model accuracy. The accuracy of OPC model with shrink correction was compared with that without shrink correction, and total RMS error was decreased by 12% by using the shrink correction technique. It can be concluded that the use of CD-SEM contours and the shrink correction of contours are effective to improve the accuracy of OPC model for the 10-nm node process.

  5. Combined dose and geometry correction (DMG) for low energy multi electron beam lithography (5kV): application to the 16nm node

    NASA Astrophysics Data System (ADS)

    Martin, Luc; Manakli, Serdar; Bayle, Sebastien; Belledent, Jérôme; Soulan, Sebastien; Wiedemann, Pablo; Farah, Abdi; Schiavone, Patrick

    2012-03-01

    Lithography faces today many challenges to meet the ITRS road-map. 193nm is still today the only existing industrial option to address high volume production for the 22nm node. Nevertheless to achieve such a resolution, double exposure is mandatory for critical level patterning. EUV lithography is still challenged by the availability of high power source and mask defectivity and suffers from a high cost of ownership perspective. Its introduction is now not foreseen before 2015. Parallel to these mask-based technologies, maskless lithography regularly makes significant progress in terms of potential and maturity. The massively parallel e-beam solution appears as a real candidate for high volume manufacturing. Several industrial projects are under development, one in the US, with the KLA REBL project and two in Europe driven by IMS Nanofabrication (Austria; MAPPER (The Netherlands). Among the developments to be performed to secure the takeoff of the multi-beam technology, the availability of a rapid and robust data treatment solution will be one of the major challenges. Within this data preparation flow, advanced proximity effect corrections must be implemented to address the 16nm node and below. This paper will detail this process and compare correction strategies in terms of robustness and accuracy. It will be based on results obtained using a MAPPER tool within the IMAGINE program driven by CEA-LETI, in Grenoble, France. All proximity effects corrections and the dithering step were performed using the software platform Inscale® from Aselta Nanographics. One important advantage of Inscale® is the ability to combine both model based dose and geometry adjustment to accurately pattern critical features. The paper will focus on the advantage of combining those two corrections at the 16nm node instead of using only geometry corrections. Thanks to the simulation capability of Inscale®, pattern fidelity and correction robustness will be evaluated and compared between

  6. Black border, mask 3D effects: covering challenges of EUV mask architecture for 22nm node and beyond

    NASA Astrophysics Data System (ADS)

    Davydova, Natalia; van Setten, Eelco; de Kruif, Robert; Connolly, Brid; Fukugami, Norihito; Kodera, Yutaka; Morimoto, Hiroaki; Sakata, Yo; Kotani, Jun; Kondo, Shinpei; Imoto, Tomohiro; Rolff, Haiko; Ullrich, Albrecht; Jaganatharaja, Ramasubramanian Kottumakulal; Lammers, Ad; Oorschot, Dorothe; Man, Cheuk-Wah; Schiffelers, Guido; van Dijk, Joep

    2014-10-01

    Photomask is at the heart of a lithographic scanner's optical path. It cannot be left non-optimized from the imaging point of view. In this work we provide new insights on two critical aspects of EUV mask architecture: optimization of absorber for 16 nm half-pitch imaging and a systematic approach to black border EUV and DUV reflectance specifications. Good 16 nm imaging is demonstrated on ASML NXE:3300 EUV scanner. Currently a relatively high dose resist is used for imaging and the dose reduction is desired. Optimization (reduction) of absorber height and mask CD bias can allow for up to 30% dose reduction without essential contrast loss. Disadvantages of absorber height reduction are ~7 nm increase of best focus range through pitch and tighter absorber height mean to target and uniformity requirements. A disadvantage of a smaller reticle CD (down to 14 nm 1x) is manufacturing process uniformity over the reticle. A systematic approach of black border reflections impact on imaging is established. The image border is a pattern free dark area surrounding the image field and preventing exposure of the image field neighborhood on wafer. Currently accepted design of the black border on EUV reticle is an image border where the absorber and multilayer stack are etched down to the substrate and EUV reflectance is reduced to <0.05%. DUV reflectance of such a black border is about 5%. It is shown that a tighter DUV reflectance specification <1.5% is required driven by the impact of DUV reflections from the black border on imaging. NXE:3300 and NXE:3100 experimental imaging results are shown. The need of low DUV wavelength reflectance metrology (in the range 100-300 nm) is demonstrated using an estimated NXE scanner out-of-band DUV spectrum. Promising results of low DUV reflectance of the black border are shown.

  7. Phase-change memory technology with self-aligned μTrench cell architecture for 90 nm node and beyond

    NASA Astrophysics Data System (ADS)

    Pirovano, A.; Pellizzer, F.; Tortorelli, I.; Riganó, A.; Harrigan, R.; Magistretti, M.; Petruzza, P.; Varesi, E.; Redaelli, A.; Erbetta, D.; Marangon, T.; Bedeschi, F.; Fackenthal, R.; Atwood, G.; Bez, R.

    2008-09-01

    A novel self-aligned μTrench-based cell architecture for phase change memory (PCM) process is presented. The low programming current and the good dimensional control of the sub-lithographic features achieved with the μTrench structure are combined with a self-aligned patterning strategy that simplify the integration process in term of alignment tolerances and of number of critical masks. The proposed architecture has been integrated in a 90 nm 128 Mb vehicle based on a pnp bipolar junction transistor for the array selection. The good active and leakage currents achieved by the purposely optimized selecting transistors combined with programming currents of 300 μA of the storage element and good distributions measured on the 128 Mb array demonstrate the suitability of the proposed architecture for the production of high-density PCM arrays at 90 nm and beyond.

  8. A practical alternating PSM modeling and OPC approach to deal with 3D mask effects for the 65nm node and beyond

    NASA Astrophysics Data System (ADS)

    Drapeau, Martin; van Adrichem, Paul J. M.; van Look, Lieve; Kasprowicz, Bryan S.

    2005-11-01

    Alternating PSM (Alt-PSM) has been recognized as a logical Resolution Enhancement Technique (RET) candidate for the 65nm technology node. One of the key properties this technique has to offer is high Depth of Focus (DOF) and lower Mask Error Enhancement Factor (MEEF). The so-called image imbalance is an Alt-PSM specific property which, if not dealt with correctly, constrains the added DOF. Because of mask topography, intensity differences caused by light scattering become evident between π (180°) and zero degree phase shifters. This causes a line shift that is inversely proportional to the pitch. The traditional solution of applying a fixed trench bias increases the width if the π phase shifter to level out intensities and thus minimize image imbalance. This technique may no longer be sufficient at the 65nm technology node. With the requirement to print even smaller pitches together with a tighter Critical Dimension (CD) budget, intensity imbalance is a larger concern. It may be necessary to apply a pitch dependent or variable trench bias. In this paper, we present a practical OPC modeling approach that accounts for image imbalance. The 2D modeling approach uses boundary layers to represent the 3D effect of light scattering. We demonstrate that with the boundary layer model, it is possible to predict image imbalance caused by mask 3D effects. The model can then be used either to determine the nominal trench bias or can be integrated into the OPC engine to apply a variable trench bias. Results are compared to rigorous Electro Magnetic Field (EMF) simulations and experimental exposures using an ArF scanner, targeting pitches of 130nm and above.

  9. Low leakage Ru-strontium titanate-Ru metal-insulator-metal capacitors for sub-20 nm technology node in dynamic random access memory

    SciTech Connect

    Popovici, M. Swerts, J.; Redolfi, A.; Kaczer, B.; Aoulaiche, M.; Radu, I.; Clima, S.; Everaert, J.-L.; Van Elshocht, S.; Jurczak, M.

    2014-02-24

    Improved metal-insulator-metal capacitor (MIMCAP) stacks with strontium titanate (STO) as dielectric sandwiched between Ru as top and bottom electrode are shown. The Ru/STO/Ru stack demonstrates clearly its potential to reach sub-20 nm technology nodes for dynamic random access memory. Downscaling of the equivalent oxide thickness, leakage current density (J{sub g}) of the MIMCAPs, and physical thickness of the STO have been realized by control of the Sr/Ti ratio and grain size using a heterogeneous TiO{sub 2}/STO based nanolaminate stack deposition and a two-step crystallization anneal. Replacement of TiN with Ru as both top and bottom electrodes reduces the amount of electrically active defects and is essential to achieve a low leakage current in the MIM capacitor.

  10. Integrated photomask defect printability check, mask repair, and repair validation procedure for phase-shifting masks for the 45-nm node and beyond

    NASA Astrophysics Data System (ADS)

    Ehrlich, Christian; Buttgereit, Ute; Boehm, Klaus; Scheruebl, Thomas; Edinger, Klaus; Bret, Tristan

    2007-10-01

    The decreasing feature sizes as induced by the ITRS have a growing impact on the cost of current and future photolithographic masks. The assessment, repair and repair validation of these expensive masks has become a very substantial factor of the total mask production cost. The introduction of immersion lithography and the proposed introduction of double exposure strategies will further amplify this trend. In order to make the whole procedure more manageable in a production environment, with its constraints on timing and resource allocation, a seamless workflow of the repair and validation procedure is sought. A proposed way to achieve this is the set up of a dedicated tool set with a backbone infrastructure designed for this workflow as well as for the specific high resolution task. In this paper we concentrate on masks with feature sizes relevant for the 45nm node and defects with typical size and shape as they appear in production. Phase shifting masks with synthetic defects have been manufactured and the printability of the defects is analyzed with an AIMS TM45-193i. In part the defect outline and three-dimensional shape as well as further characteristics have been visualized with an electron microscope, prior to repairing them with an electron beam based repair system. In addition we will show the behaviour of the phase of the mask in a region of interest, that is in this case the repair area and its immediate vicinity. This will be done by a special new tool, named Phame ®, developed for measuring the actual phase of smallest mask features with a high spatial resolution. In the conclusion we will give an outlook how the proposed workflow and the how the employed technologies will influence the masks that are expected to emerge for the 32nm node.

  11. Advanced mask technique to improve bit line CD uniformity of 90 nm node flash memory in low-k1 lithography

    NASA Astrophysics Data System (ADS)

    Kim, Jong-doo; Choi, Jae-young; Kim, Jea-hee; Han, Jae-won

    2008-10-01

    As devices size move toward 90nm technology node or below, defining uniform bit line CD of flash devices is one of the most challenging features to print in KrF lithography. There are two principal difficulties in defining bit line on wafer. One is insufficient process margin besides poor resolution compared with ArF lithography. The other is that asymmetric bit line should be made for OPC(Optical Proximity Correction) modeling. Therefore advanced ArF lithography scanner should be used for define bit line with RETs (Resolution Enhancement Techniques) such as immersion lithography, OPC, PSM(Phase Shift Mask), high NA(Numerical Aperture), OAI(Off-Axis Illumination), SRAF(Sub-resolution Assistant Feature), and mask biasing.. Like this, ArF lithography propose the method of enhancing resolution, however, we must spend an enormous amount of CoC(cost of ownership) to utilize ArF photolithography process than KrF. In this paper, we suggest method to improve of bit line CD uniformity, patterned by KrF lithographic process in 90nm sFlash(stand alone Flash) devices. We applied new scheme of mask manufacturing, which is able to realize 2 different types of mask, binary and phase-shift, into one plate. Finally, we could get the more uniform bit lines and we expect to get more stable properties then before applying this technique.

  12. Optimization of resist shrink techniques for contact hole and metal trench ArF lithography at the 90-nm technology node

    NASA Astrophysics Data System (ADS)

    Wallace, Christine; Schacht, Jochen; Huang, I. H.; Hsu, Ruei H.

    2004-05-01

    Two fundamentally different approaches for chemical ArF resist shrinkage are evaluated and integrated into process flows for 90 nm technology node. The chemical shrink and the corresponding gain in process window is studied in detail for different resist types with respect to CD uniformity through pitch, linearity and resist profiles. For both, SAFIER and RELACS material, the sensitivity of the shrink process with respect to the baking temperature is characterized by a temperature matrix to check process stability, and optimized conditions are found offering an acceptable amount of shrinkage at contact and trench levels. For the SAFIER material, thermal flow contributes to the chemical shrink which is a function of the photoresist chemistry and its hydrodynamic properties depending on the resists" glass transition temperature (Tg) and the baking temperature: at baking temperatures close to Tg, a proximity and pattern dependent shrink is observed. For a given resist, line-space patterns and contact holes shrink differently, and their resist profiles are affected significantly. Additionally, the chemical shrinkage depends on the size of contact holes and resist profile prior to the application of the SAFIER process. At baking temperatures below Tg some resists exhibit no shrink at all. The RELACS technique offers a constant shrink for contacts at various pitches and sizes. This shrink can be moderately adjusted and controlled by varying the mixing bake temperature which is generally and preferably below the glass transistion temperature of the resist, therefore no resist profile degradation is observed. A manufacturable process with a shrink of 20nm using RELACS at the contact layer is demonstrated. Utilizing an increased reticle bias in combination with an increased CD target prior to the chemical shrink, the common lithography process window at contact layer was increased by 0.15um. The results also indicate a possibility for an extension of the shrink to greater

  13. Integration and automation of DoseMapper in a logic fab APC system: application for 45/40/28nm node

    NASA Astrophysics Data System (ADS)

    Le Gratiet, Bertrand; Salagnon, Christophe; de Caunes, Jean; Mikolajczak, Marc; Morin, Vincent; Chojnowski, Nicolas; Sundermann, Frank; Massin, Jean; Pelletier, Alice; Metz, Joel; Blancquaert, Yoann; Bouyssou, Regis; Pelissier, Arthur; Belmont, Olivier; Strapazzon, Anne; Phillips, Anna; Devoivre, Thierry; Bernard, Emilie; Batail, Estelle; Thevenon, Lionel; Bry, Benedicte; Bernard-Granger, Fabrice; Oumina, Ahmed; Baron, Marie-Pierre; Gueze, Didier

    2012-03-01

    The main difficulty related to DoseMapper correction is to generate an appropriate CD datacollection to feed DoseMapper and to generate DoseRecipe in a user friendly way, especially with a complex process mix. We could heavily measure the silicon and create, in feedback mode, the corresponding DoseRecipe. However, such approach in a logic fab becomes a heavy duty due to the number of different masks / product / processes. We have observed that process CD variability is significantly depending on systematic intrawafer and intrafield CD footprints that can be measured and applied has generic pre-correction for any new product/mask process in-line. The applied CD correction is based on a CD (intrafield: Mask + Straylight & intrawafer: Etch Bias) variability "model" handled by the FAB APC (Advanced Process Control). - Individual CD profile correction component are generated "off-line" (1) for Intrafield Mask via automatic CD extraction from a Reticle CD database (2) for Intrafield Straylight via a CD "model" (3) for Intrawafer Etch Bias via engineering input based on process monitoring. - These CD files are handled via the FAB APC/automation system which is remotely taking control of DoseMapper server via WEB services, so that CD profiles are generated "off-line" (before the lot is being processed) and stored in a profile database while DoseRecipes are created "real-time" on demand via the automation when the lot comes to the scanner to be processed. DoseRecipe and CD correction profiles management is done via the APC system. The automated DoseRecipe creation is now running since the beginning of 2011 contributing to bring both intrafield and intrawafer GATE CDu below 1nm 3sigma, for 45/40 & 28nm nodes.

  14. W versus Co-Al as Gate Fill-Metal for Aggressively Scaled Replacement High-k/Metal Gate Devices for (Sub-)22 nm Technology Nodes

    NASA Astrophysics Data System (ADS)

    Veloso, Anabela; Aik Chew, Soon; Schram, Tom; Dekkers, Harold; Van Ammel, Annemie; Witters, Thomas; Tielens, Hilde; Heylen, Nancy; Devriendt, Katia; Sebaai, Farid; Brus, Stephan; Ragnarsson, Lars-Åke; Pantisano, Luigi; Eneman, Geert; Carbonell, Laure; Richard, Olivier; Favia, Paola; Geypen, Jef; Bender, Hugo; Higuchi, Yuichi; Phatak, Anup; Thean, Aaron; Horiguchi, Naoto

    2013-04-01

    In this work we provide a comprehensive evaluation of a novel, low-resistance Co-Al alloy vs W to fill aggressively scaled gates with high aspect-ratios [gate height (Hgate) ˜50-60 nm, gate length (Lgate) ≥20-25 nm]. We demonstrate that, with careful liner/barrier materials selection and tuning, well-behaved devices are obtained, showing: tight gate resistance (Rgate) distributions down to Lgate˜20 nm, low threshold voltage (VT) values, comparable DC and bias temperature instability (BTI) behavior, and improved RF response. The impact of fill-metals intrinsic stress, including the presence of occasional voids in narrow W-gates, on devices fabrication and performance is also explored.

  15. Advanced TEM Characterization for the Development of 28-14nm nodes based on fully-depleted Silicon-on-Insulator Technology

    NASA Astrophysics Data System (ADS)

    Servanton, G.; Clement, L.; Lepinay, K.; Lorut, F.; Pantel, R.; Pofelski, A.; Bicais, N.

    2013-11-01

    The growing demand for wireless multimedia applications (smartphones, tablets, digital cameras) requires the development of devices combining both high speed performances and low power consumption. A recent technological breakthrough making a good compromise between these two antagonist conditions has been proposed: the 28-14nm CMOS transistor generations based on a fully-depleted Silicon-on-Insulator (FD-SOI) performed on a thin Si film of 5-6nm. In this paper, we propose to review the TEM characterization challenges that are essential for the development of extremely power-efficient System on Chip (SoC).

  16. Dual frequency mid-gap capacitively coupled plasma (m-CCP) for conventional and DSA patterning at 10nm node and beyond

    NASA Astrophysics Data System (ADS)

    Mohanty, Nihar; Ko, Akiteru; Cole, Christopher; Rastogi, Vinayak; Kumar, Kaushik; Schmid, Gerard; Farrell, Richard; Ryan, Todd; Hosler, Erik; Xu, Ji; Preil, Moshe

    2014-03-01

    In this paper, we demonstrate the unique advantage of dual-frequency mid-gap capacitively coupled plasma (m-CCP) in advanced node patterning process with regard to etch rate / depth uniformity and critical dimension (CD) control in conjunction with wider process window for aspect ratio dependent & microloading effects. Unlike the non-planar plasma sources, the simple design of the mid-gap CCPs enables both metal and non-metal hard-mask based patterning, which provides essential flexibility for conventional and DSA patterning. We present data on both, the conventional multi patterning as well as DSA patterning for trenches / fins and holes. Rigorous CD control and CDU is shown to be crucial for multi patterning as they lead to undesirable odd-even delta and pitch walking. For DSA patterning, co-optimized Ne / Vdc of the dual frequency CCPs would be demonstrated to be advantageous for higher organic-to-organic selectivity during co-polymer etching.

  17. Benchmarks of a III-V TFET technology platform against the 10-nm CMOS FinFET technology node considering basic arithmetic circuits

    NASA Astrophysics Data System (ADS)

    Strangio, S.; Palestri, P.; Lanuzza, M.; Esseni, D.; Crupi, F.; Selmi, L.

    2017-02-01

    In this work, a benchmark for low-power digital applications of a III-V TFET technology platform against a conventional CMOS FinFET technology node is proposed. The analysis focuses on full-adder circuits, which are commonly identified as representative of the digital logic environment. 28T and 24T topologies, implemented in complementary-logic and transmission-gate logic, respectively, are investigated. Transient simulations are performed with a purpose-built test-bench on each single-bit full adder solution. The extracted delays and energy characteristics are post-processed and translated into figures-of-merit for multi-bit ripple-carry-adders. Trends related to the different full-adder implementations (for the same device technology platform) and to the different technology platforms (for the same full-adder topology) are presented and discussed.

  18. Effects of deprotonation efficiency of protected units on line edge roughness and stochastic defect generation in chemically amplified resist processes for 11 nm node of extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Kozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro

    2014-11-01

    The deprotonation of polymer radical cations plays an important role in the acid generation in chemically amplified resists upon exposure to ionizing radiation. In this study, the effects of the deprotonation efficiency of protected units of a resist polymer on line edge roughness (LER) and stochastic defect generation were investigated. The suppression of stochastic effects is essential for the realization of high-volume production of semiconductor devices with an 11 nm critical dimension using extreme ultraviolet (EUV) lithography. By increasing the deprotonation efficiency, the chemical contrast (latent image quality) was improved; however, the protected unit number fluctuation did not significantly change. Consequently, LER and the probability of stochastic defect generation were reduced. This effect was prominent when the protection ratio was close to 100%.

  19. Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for 10nm technology nodes and beyond

    NASA Astrophysics Data System (ADS)

    Wang, Lynn T.; Schroeder, Uwe Paul; Woo, Youngtag; Zeng, Jia; Madhavan, Sriram; Capodieci, Luigi

    2016-03-01

    A pattern-based methodology for optimizing Self-Aligned Double Patterning (SADP)-compliant layout designs is developed based on detecting cut-induced hotspot patterns and replacing them with pre-characterized fixing solutions. A pattern library with predetermined fixing solutions is built. A pattern-based engine searches for matching patterns in the layout designs. When a match is found, the engine opportunistically replaces the detected pattern with a pre-characterized fixing solution, preserving only the design rule check-clean replacements. The methodology is demonstrated on a 10nm routed block. A small library of fourteen patterns reduced the number of cut-induced design rule check violations by 100% and lithography hotspots by 23%.

  20. Ising models on the 2 x 2 x {infinity} lattices

    SciTech Connect

    Yurishchev, M. A.

    2007-03-15

    Exact analytic solutions are presented for two 2 x 2 x {infinity} Ising etageres. The first model has a simple cubic lattice with fully anisotropic interactions. The second model consists of two different types of linear chains and includes noncrossing diagonal bonds on the side faces of the 2 x 2 x {infinity} parallelepiped. In both cases, the solutions are expressed through square radicals and obtained by using the obvious symmetry of the Hamiltonians, Z{sub 2} x C{sub 2v}, and the hidden algebraic {lambda}{lambda} symmetry of the transfer matrix secular equations. The solution found for the second model is used to analyze the behavior of specific heat in a frustrated many-chain system.

  1. In-field in-design metrology target integration for advanced CD and overlay process control via DoseMapper and high order overlay correction for 28nm and beyond logic node

    NASA Astrophysics Data System (ADS)

    Ducoté, J.; Bernard-Granger, F.; Le-Gratiet, B.; Bouyssou, R.; Bianchini, R.; Marin, J. C.; Baron, M. P.; Gardet, F.; Devoivre, T.; Batail, E.; Pouly, C.; Gueze, D.; Thevenon, L.

    2013-04-01

    Current process tool performances are getting significantly enhanced by the adoption of advanced process correction application such as DoseMapper for CD or high order overlay correction for overlay. These process control capabilities need appropriate sampling to be efficient. Usually for in field metrology sampling we used to operate with metrology targets placed inside the scribe lines, however in this case the larger the chip the less scribe lines we have and the less relevant is the intrafield sampling. As ST is an IDM we have the opportunity to share with our design division this process control problematic. Since 45/40nm node we have started to put in place the so-called EMET (Embedded Metrology Target) strategy which consists in in-design metrology targets placement. Initially these targets were placed using tiling tools but it soon appeared to be not efficient and even impossible when we talk about targets involving complex metal stack. This papers talks about our current embedded metrology target strategy which has been adapted to enable appropriate target placement for CD and overlay for all critical layers from active to via/metal's. Solutions needed to be put in place to (i) keep the circuit safe by using Design Rule clean metrology targets, (ii) be highly visible by the designers by placing targets at chip floor planning definition (iii) be upgradable by enabling target re-designs without impact on chip design version.

  2. Lymph nodes

    MedlinePlus Videos and Cool Tools

    ... and conveying lymph and by producing various blood cells. Lymph nodes play an important part in the ... the microorganisms being trapped inside collections of lymph cells or nodes. Eventually, these organisms are destroyed and ...

  3. Modulation of P2X3 and P2X2/3 Receptors by Monoclonal Antibodies.

    PubMed

    Shcherbatko, Anatoly; Foletti, Davide; Poulsen, Kris; Strop, Pavel; Zhu, Guoyun; Hasa-Moreno, Adela; Melton Witt, Jody; Loo, Carole; Krimm, Stellanie; Pios, Ariel; Yu, Jessica; Brown, Colleen; Lee, John K; Stroud, Robert; Rajpal, Arvind; Shelton, David

    2016-06-03

    Purinergic homomeric P2X3 and heteromeric P2X2/3 receptors are ligand-gated cation channels activated by ATP. Both receptors are predominantly expressed in nociceptive sensory neurons, and an increase in extracellular ATP concentration under pathological conditions, such as tissue damage or visceral distension, induces channel opening, membrane depolarization, and initiation of pain signaling. Hence, these receptors are considered important therapeutic targets for pain management, and development of selective antagonists is currently progressing. To advance the search for novel analgesics, we have generated a panel of monoclonal antibodies directed against human P2X3 (hP2X3). We have found that these antibodies produce distinct functional effects, depending on the homomeric or heteromeric composition of the target, its kinetic state, and the duration of antibody exposure. The most potent antibody, 12D4, showed an estimated IC50 of 16 nm on hP2X3 after short term exposure (up to 18 min), binding to the inactivated state of the channel to inhibit activity. By contrast, with the same short term application, 12D4 potentiated the slow inactivating current mediated by the heteromeric hP2X2/3 channel. Extending the duration of exposure to ∼20 h resulted in a profound inhibition of both homomeric hP2X3 and heteromeric hP2X2/3 receptors, an effect mediated by efficient antibody-induced internalization of the channel from the plasma membrane. The therapeutic potential of mAb12D4 was assessed in the formalin, complete Freund's adjuvant, and visceral pain models. The efficacy of 12D4 in the visceral hypersensitivity model indicates that antibodies against P2X3 may have therapeutic potential in visceral pain indications.

  4. Ion Implant Enabled 2x Lithography

    NASA Astrophysics Data System (ADS)

    Martin, Patrick M.; Godet, Ludovic; Cheung, Andrew; de Cock, Gael; Hatem, Chris

    2011-01-01

    Ion implantation has many applications in microelectronics beyond doping. The broad range of species available combined with the ability to precisely control dose, angle, and energy offers compelling advantages for use in precision material modification. The application to lithography has been reported elsewhere. Integrating ion implantation into the lithography process enables scaling the feature size requirements beyond the 15 nm node with a simplified double patterning sequence. In addition, ion implant may be used to remove line edge roughness, providing tremendous advantages to meet extreme lithography imaging requirements and provide additional device stability. We examine several species (e.g. Si, Ar, etc.) and the effect of energy and impact angle on several commercially available 193 nm immersion photoresists using a Varian VIISta® single wafer high current ion implanter. The treated photoresist will be evaluated for stability in an integrated double patterning application with ion implant used to freeze the primary image. We report on critical dimension impact, pattern integrity, optical property modification, and adhesion. We analyze the impact of line edge roughness improvement beyond the work of C. Struck including the power spectral distribution. TGA and FTIR Spectroscopy results for the implanted photoresist materials will also be included.

  5. Study towards integration of In0.53Ga0.47As on 300 mm Si for CMOS sub-7 nm node: Development of thin graded InxGa1-xAs buffers on GaAs

    NASA Astrophysics Data System (ADS)

    Mols, Y.; Kunert, B.; Gaudin, G.; Langer, R.; Caymax, M.

    2016-10-01

    High-quality InxGa1-xAs layers with indium composition between 0.46 and 0.50 have been grown in a 300 mm industrial MOVPE reactor using ≤1 μm thin InxGa1-xAs buffers on 2″ GaAs substrates. Aggressive grading of 3.7 to 3.8% misfit/μm, fast growth rates in the range of 0.2-2.2 nm/s and low growth temperatures of 530 °C and 450 °C were used. AFM reveals a significant difference in root mean square surface roughness of 3.6 nm (530 °C) versus 15.5 nm (450 °C). Cross-section TEM analysis shows that for both temperatures threading dislocations are effectively confined to the buffer region. However, at 450 °C phase separation is observed in the upper part of the structure. From plan-view TEM threading dislocation densities as low as 1×105 cm-2 and 4.5×105 cm-2 are estimated for growth at 530 °C and 450 °C, respectively.

  6. P2X7 receptor knockout prevents streptozotocin-induced type 1 diabetes in mice.

    PubMed

    Vieira, Flávia Sarmento; Nanini, Hayandra Ferreira; Takiya, Christina Maeda; Coutinho-Silva, Robson

    2016-01-05

    Type 1 diabetes (T1D) is caused by autoimmune destruction of islet of Langerhans β-cells. P2X7 receptors (P2X7R) modulate proinflammatory immune responses by binding extracellular ATP, a classic 'danger signal'. Here, we evaluated whether the P2X7R has a role in T1D development. P2X7(-/-) mice are resistant to TD1 induction by streptozotocin (STZ) treatment, with no increase in blood glucose, decrease in insulin-positive cells, and pancreatic islet reduction, compared to WT (C57BL/6) mice. Also, the levels of proinflammatory mediators (IL-1β, IFN-γ and NO) did not increase after STZ treatment in P2X7(-/-) animals, with reduced infiltration of CD4(+), CD8(+), B220(+), CD11b(+) and CD11c(+) cells in the pancreatic lymph nodes. Treatment with a P2X7 antagonist mimicked the effect of P2X7 knockout, preventing STZ-induced diabetes. Our results show that the absence of the P2X7R provides resistance in the induction of diabetes in this model, and suggest that therapy targeting the P2X7R may be useful against clinical T1D.

  7. J-2X Engine Tested at Stennis

    NASA Video Gallery

    Another key component of NASA's new Space Launch System, the J-2X rocket engine, is put to a 500-second firing test at NASA's Stennis Space Center on Nov. 9 The J-2X rocket engine will help carry t...

  8. Can DUV take us below 100 nm?

    NASA Astrophysics Data System (ADS)

    Finders, Jo; Jorritsma, Louis; Eurlings, Mark; Moerman, Richard; van Greevenbroek, Henk; van Schoot, Jan B.; Flagello, Donis G.; Socha, Robert J.; Stammler, Thomas

    2001-09-01

    Currently, the 130 nm SIA node is being implemented at leading edge semiconductor manufacturing facilities. Previously, this node appeared to be the insertion point for 193 nm lithography. However, it is evident that for the majority of applications 248 nm will be the wavelength of choice. This once again raises the question how far DUV lithography (248 nm) will take us. To investigate this, overlay, imaging and productivity related issues have to be considered. Although these items become more and more linked at low k1-factors (e.g. overlay and imaging), this paper will focus on some of the imaging related topics.

  9. Optical control of trimeric P2X receptors and acid-sensing ion channels.

    PubMed

    Browne, Liam E; Nunes, João P M; Sim, Joan A; Chudasama, Vijay; Bragg, Laricia; Caddick, Stephen; North, R Alan

    2014-01-07

    P2X receptors are trimeric membrane proteins that function as ion channels gated by extracellular ATP. We have engineered a P2X2 receptor that opens within milliseconds by irradiation at 440 nm, and rapidly closes at 360 nm. This requires bridging receptor subunits via covalent attachment of 4,4'-bis(maleimido)azobenzene to a cysteine residue (P329C) introduced into each second transmembrane domain. The cis-trans isomerization of the azobenzene pushes apart the outer ends of the transmembrane helices and opens the channel in a light-dependent manner. Light-activated channels exhibited similar unitary currents, rectification, calcium permeability, and dye uptake as P2X2 receptors activated by ATP. P2X3 receptors with an equivalent mutation (P320C) were also light sensitive after chemical modification. They showed typical rapid desensitization, and they could coassemble with native P2X2 subunits in pheochromocytoma cells to form light-activated heteromeric P2X2/3 receptors. A similar approach was used to open and close human acid-sensing ion channels (ASICs), which are also trimers but are unrelated in sequence to P2X receptors. The experiments indicate that the opening of the permeation pathway requires similar and substantial movements of the transmembrane helices in both P2X receptors and ASICs, and the method will allow precise optical control of P2X receptors or ASICs in intact tissues.

  10. P2X7 receptor promotes intestinal inflammation in chemically induced colitis and triggers death of mucosal regulatory T cells.

    PubMed

    Figliuolo, Vanessa R; Savio, Luiz Eduardo Baggio; Safya, Hanaa; Nanini, Hayandra; Bernardazzi, Cláudio; Abalo, Alessandra; de Souza, Heitor S P; Kanellopoulos, Jean; Bobé, Pierre; Coutinho, Cláudia M L M; Coutinho-Silva, Robson

    2017-03-07

    P2X7 receptor activation contributes to inflammation development in different pathologies. We previously reported that the P2X7 receptor is over-expressed in the gut mucosa of patients with inflammatory bowel disease, and that P2X7 inhibition protects against chemically induced colitis. Here, we investigated in detail the role of the P2X7 receptor in inflammatory bowel disease development, by treating P2X7 knockout (KO) and WT mice with two different (and established) colitis inductors. P2X7 KO mice were protected against gut inflammation induced by 2,4,6-trinitrobenzenesulfonic acid or oxazolone, with no weight loss or gut histological alterations after treatment. P2X7 receptor knockout induced regulatory T cell accumulation in the colon, as evaluated by qRT-PCR for FoxP3 expression and immunostaining for CD90/CD45RB(low). Flow cytometry analysis of mesenteric lymph node cells showed that P2X7 activation (by ATP) triggered regulatory T cell death. In addition, such cells from P2X7 KO mice expressed more CD103, suggesting increased migration of regulatory T cells to the colon (relative to the WT). Our results show that the P2X7 has a key role during inflammation development in inflammatory bowel disease, by triggering the death and retention in the mesenteric lymph nodes of regulatory T cells that would otherwise promote immune system tolerance in the gut.

  11. P2X Receptors as Drug Targets

    PubMed Central

    Jarvis, Michael F.

    2013-01-01

    The study of P2X receptors has long been handicapped by a poverty of small-molecule tools that serve as selective agonists and antagonists. There has been progress, particularly in the past 10 years, as cell-based high-throughput screening methods were applied, together with large chemical libraries. This has delivered some drug-like molecules in several chemical classes that selectively target P2X1, P2X3, or P2X7 receptors. Some of these are, or have been, in clinical trials for rheumatoid arthritis, pain, and cough. Current preclinical research programs are studying P2X receptor involvement in pain, inflammation, osteoporosis, multiple sclerosis, spinal cord injury, and bladder dysfunction. The determination of the atomic structure of P2X receptors in closed and open (ATP-bound) states by X-ray crystallography is now allowing new approaches by molecular modeling. This is supported by a large body of previous work using mutagenesis and functional expression, and is now being supplemented by molecular dynamic simulations and in silico ligand docking. These approaches should lead to P2X receptors soon taking their place alongside other ion channel proteins as therapeutically important drug targets. PMID:23253448

  12. Reconfigureable network node

    DOEpatents

    Vanderveen, Keith B.; Talbot, Edward B.; Mayer, Laurence E.

    2008-04-08

    Nodes in a network having a plurality of nodes establish communication links with other nodes using available transmission media, as the ability to establish such links becomes available and desirable. The nodes predict when existing communications links will fail, become overloaded or otherwise degrade network effectiveness and act to establish substitute or additional links before the node's ability to communicate with the other nodes on the network is adversely affected. A node stores network topology information and programmed link establishment rules and criteria. The node evaluates characteristics that predict existing links with other nodes becoming unavailable or degraded. The node then determines whether it can form a communication link with a substitute node, in order to maintain connectivity with the network. When changing its communication links, a node broadcasts that information to the network. Other nodes update their stored topology information and consider the updated topology when establishing new communications links for themselves.

  13. J-2X: Back in the Saddle

    NASA Video Gallery

    A J-2X power pack assembly burns brightly during a hot fire test Nov. 27 at NASA's Stennis Space Center in Mississippi. Engineers pulled the assembly from the test stand in September to install add...

  14. NASA Continues J-2X Powerpack Testing

    NASA Video Gallery

    NASA conducted a long duration test of the J-2X powerpack, 340 seconds total, at the Stennis Space Center in southern Mississippi on May 10, marking another step in SLS development, the next-genera...

  15. J-2X Turbopump Cavitation Diagnostics

    NASA Technical Reports Server (NTRS)

    Santi, I. Michael; Butas, John P.; Tyler, Thomas R., Jr.; Aguilar, Robert; Sowers, T. Shane

    2010-01-01

    The J-2X is the upper stage engine currently being designed by Pratt & Whitney Rocketdyne (PWR) for the Ares I Crew Launch Vehicle (CLV). Propellant supply requirements for the J-2X are defined by the Ares Upper Stage to J-2X Interface Control Document (ICD). Supply conditions outside ICD defined start or run boxes can induce turbopump cavitation leading to interruption of J-2X propellant flow during hot fire operation. In severe cases, cavitation can lead to uncontained engine failure with the potential to cause a vehicle catastrophic event. Turbopump and engine system performance models supported by system design information and test data are required to predict existence, severity, and consequences of a cavitation event. A cavitation model for each of the J-2X fuel and oxidizer turbopumps was developed using data from pump water flow test facilities at Pratt & Whitney Rocketdyne (PWR) and Marshall Space Flight Center (MSFC) together with data from Powerpack 1A testing at Stennis Space Center (SSC) and from heritage systems. These component models were implemented within the PWR J-2X Real Time Model (RTM) to provide a foundation for predicting system level effects following turbopump cavitation. The RTM serves as a general failure simulation platform supporting estimation of J-2X redline system effectiveness. A study to compare cavitation induced conditions with component level structural limit thresholds throughout the engine was performed using the RTM. Results provided insight into system level turbopump cavitation effects and redline system effectiveness in preventing structural limit violations. A need to better understand structural limits and redline system failure mitigation potential in the event of fuel side cavitation was indicated. This paper examines study results, efforts to mature J-2X turbopump cavitation models and structural limits, and issues with engine redline detection of cavitation and the use of vehicle-side abort triggers to augment the

  16. Swollen lymph nodes

    MedlinePlus

    ... lymph nodes, including: Seizure medicines such as phenytoin Typhoid immunization Which lymph nodes are swollen depends on ... hard, irregular, or fixed in place. You have fever, night sweats, or unexplained weight loss. Any node ...

  17. Use-dependent inhibition of P2X3 receptors by nanomolar agonist.

    PubMed

    Pratt, Emily B; Brink, Thaddeus S; Bergson, Pamela; Voigt, Mark M; Cook, Sean P

    2005-08-10

    P2X3 receptors desensitize within 100 ms of channel activation, yet recovery from desensitization requires several minutes. The molecular basis for this slow rate of recovery is unknown. We designed experiments to test the hypothesis that this slow recovery is attributable to the high affinity (< 1 nM) of desensitized P2X3 receptors for agonist. We found that agonist binding to the desensitized state provided a mechanism for potent inhibition of P2X3 current. Sustained applications of 0.5 nM ATP inhibited > 50% of current to repetitive applications of P2X3 agonist. Inhibition occurred at 1000-fold lower agonist concentrations than required for channel activation and showed strong use dependence. No inhibition occurred without previous activation and desensitization. Our data are consistent with a model whereby inhibition of P2X3 by nanomolar [agonist] occurs by the rebinding of agonist to desensitized channels before recovery from desensitization. For several ATP analogs, the concentration required to inhibit P2X3 current inversely correlated with the rate of recovery from desensitization. This indicates that the affinity of the desensitized state and recovery rate primarily depend on the rate of agonist unbinding. Consistent with this hypothesis, unbinding of [32P]ATP from desensitized P2X3 receptors mirrored the rate of recovery from desensitization. As expected, disruption of agonist binding by site-directed mutagenesis increased the IC50 for inhibition and increased the rate of recovery.

  18. Final J-2X Test of 2011

    NASA Video Gallery

    NASA conducted its final J-2X rocket engine test of the year Dec. 14, the 10th firing in a series of tests on the new upper-stage engine that will carry humans farther into space than ever before. ...

  19. J-2X Powerpack Completes Testing

    NASA Video Gallery

    The J-2X powerpack assembly was fired up one last time on Dec. 13 at NASA’s Stennis Space Center in Mississippi, finishing a year of testing on an important component of America’s next heavy-li...

  20. NMR probe of pseudogap characteristics in CaAl2-xSi2+x

    NASA Astrophysics Data System (ADS)

    Lue, C. S.; Wang, S. Y.; Fang, C. P.

    2007-06-01

    We report the results of a Al27 nuclear magnetic resonance (NMR) study of CaAl2-xSi2+x , near the stoichiometric composition with x=0 . The low-temperature NMR relaxation rates for stoichiometric (x=0) and nonstoichiometric ( x=-0.1 and 0.1) compounds follow a Korringa law, associated with a finite density of carriers at the Fermi level. High-temperature relaxation rates for x⩾0 go over to a semiconductorlike activated form, providing information about the electronic structure near the Fermi energy. The results are consistent with pseudogap features identified by recent band-structure calculations. An analysis of the pseudogap change vs composition further points out that the band-filling picture is proper for the understanding of the NMR observations in CaAl2-xSi2+x .

  1. Sentinel node biopsy (image)

    MedlinePlus

    Sentinel node biopsy is a technique which helps determine if a cancer has spread (metastasized), or is contained locally. When a ... is closest to the cancer site. Sentinel node biopsy is used to stage many kinds of cancer, ...

  2. Lymph node biopsy

    MedlinePlus

    ... Performed The test is used to diagnose cancer, sarcoidosis, or an infection (such as tuberculosis): When you ... of lymph nodes and other organs and tissues ( sarcoidosis ) Risks Lymph node biopsy may result in any ...

  3. Multiple node remote messaging

    DOEpatents

    Blumrich, Matthias A.; Chen, Dong; Gara, Alan G.; Giampapa, Mark E.; Heidelberger, Philip; Ohmacht, Martin; Salapura, Valentina; Steinmacher-Burow, Burkhard; Vranas, Pavlos

    2010-08-31

    A method for passing remote messages in a parallel computer system formed as a network of interconnected compute nodes includes that a first compute node (A) sends a single remote message to a remote second compute node (B) in order to control the remote second compute node (B) to send at least one remote message. The method includes various steps including controlling a DMA engine at first compute node (A) to prepare the single remote message to include a first message descriptor and at least one remote message descriptor for controlling the remote second compute node (B) to send at least one remote message, including putting the first message descriptor into an injection FIFO at the first compute node (A) and sending the single remote message and the at least one remote message descriptor to the second compute node (B).

  4. Modular sensor network node

    DOEpatents

    Davis, Jesse Harper Zehring; Stark, Jr., Douglas Paul; Kershaw, Christopher Patrick; Kyker, Ronald Dean

    2008-06-10

    A distributed wireless sensor network node is disclosed. The wireless sensor network node includes a plurality of sensor modules coupled to a system bus and configured to sense a parameter. The parameter may be an object, an event or any other parameter. The node collects data representative of the parameter. The node also includes a communication module coupled to the system bus and configured to allow the node to communicate with other nodes. The node also includes a processing module coupled to the system bus and adapted to receive the data from the sensor module and operable to analyze the data. The node also includes a power module connected to the system bus and operable to generate a regulated voltage.

  5. Entanglement monogamy inequality in a 2 x 2 x 4 system

    SciTech Connect

    Ren Xijun; Jiang Wei

    2010-02-15

    In this report, we show explicitly that the tangles of an arbitrary pure state in a 2 x 2 x 4 system satisfy the monogamy relation. This relation is also generalized to mixed states. As the tangle is always larger than the square of the concurrence, our result implies that the monogamy relation holds for concurrence too. It also supports the idea that the tangle could qualify as an elementary bipartite entanglement measure.

  6. Color-Space-Based Visual-MIMO for V2X Communication.

    PubMed

    Kim, Jai-Eun; Kim, Ji-Won; Park, Youngil; Kim, Ki-Doo

    2016-04-23

    In this paper, we analyze the applicability of color-space-based, color-independent visual-MIMO for V2X. We aim to achieve a visual-MIMO scheme that can maintain the original color and brightness while performing seamless communication. We consider two scenarios of GCM based visual-MIMO for V2X. One is a multipath transmission using visual-MIMO networking and the other is multi-node V2X communication. In the scenario of multipath transmission, we analyze the channel capacity numerically and we illustrate the significance of networking information such as distance, reference color (symbol), and multiplexing-diversity mode transitions. In addition, in the V2X scenario of multiple access, we may achieve the simultaneous multiple access communication without node interferences by dividing the communication area using image processing. Finally, through numerical simulation, we show the superior SER performance of the visual-MIMO scheme compared with LED-PD communication and show the numerical result of the GCM based visual-MIMO channel capacity versus distance.

  7. Color-Space-Based Visual-MIMO for V2X Communication †

    PubMed Central

    Kim, Jai-Eun; Kim, Ji-Won; Park, Youngil; Kim, Ki-Doo

    2016-01-01

    In this paper, we analyze the applicability of color-space-based, color-independent visual-MIMO for V2X. We aim to achieve a visual-MIMO scheme that can maintain the original color and brightness while performing seamless communication. We consider two scenarios of GCM based visual-MIMO for V2X. One is a multipath transmission using visual-MIMO networking and the other is multi-node V2X communication. In the scenario of multipath transmission, we analyze the channel capacity numerically and we illustrate the significance of networking information such as distance, reference color (symbol), and multiplexing-diversity mode transitions. In addition, in the V2X scenario of multiple access, we may achieve the simultaneous multiple access communication without node interferences by dividing the communication area using image processing. Finally, through numerical simulation, we show the superior SER performance of the visual-MIMO scheme compared with LED-PD communication and show the numerical result of the GCM based visual-MIMO channel capacity versus distance. PMID:27120603

  8. Popliteal lymph node dissection.

    PubMed

    Sholar, Alina; Martin, Robert C G; McMasters, Kelly M

    2005-02-01

    Most sentinel nodes are located in the cervical, axillary, and inguinal nodal basins. Sometimes, however, sentinel nodes exist outside these traditional nodal basins. Popliteal nodal metastasis is relatively uncommon, and popliteal lymph node dissection is infrequently necessary. However, with lymphoscintigraphic identification of popliteal sentinel nodes, surgeons are more frequently called on to address the popliteal nodal basin. Therefore, knowledge of the anatomy and surgical technique for popliteal lymphadenectomy is essential. This case study illustrates the importance of considering the approach to the popliteal lymph node basin for patients with melanoma.

  9. Inflammatory early events associated to the role of P2X7 receptor in acute murine toxoplasmosis.

    PubMed

    Corrêa, Gladys; Almeida Lindenberg, Carolina de; Moreira-Souza, Aline Cristina de Abreu; Savio, Luiz Eduardo Baggio; Takiya, Christina Maeda; Marques-da-Silva, Camila; Vommaro, Rossiane Claudia; Coutinho-Silva, Robson

    2017-04-01

    Activation of the purinergic P2X7 receptor by extracellular ATP (eATP) potentiates proinflammatory responses during infections by intracellular pathogens. Extracellular ATP triggers an antimicrobial response in macrophages infected with Toxoplasma gondii in vitro, suggesting that purinergic signaling may stimulate host defense mechanisms against toxoplasmosis. Here, we provide in vivo evidence in support of this hypothesis, by showing that P2X7(-/-) mice are more susceptible than P2X7(+/+) mice to acute infection by the RH strain of T. gondii, and that this phenomenon is associated with a deficient proinflammatory response. Four days post-infection, peritoneal washes from infected P2X7(-/-) mice had no or little increase in the levels of the proinflammatory cytokines IL-12, IL-1β, IFN-γ, and TNF-α, whose levels increased markedly in samples from infected P2X7(+/+) mice. Infected P2X7(-/-) mice displayed an increase in organ weight and histological alterations in some of the 'shock organs' in toxoplasmosis - the liver, spleen and mesenteric lymph nodes. The liver of infected P2X7(-/-) mice had smaller granulomas, but increased parasite load/granuloma. Our results confirm that the P2X7 receptor is involved in containing T. gondii spread in vivo, by stimulating inflammation.

  10. Silencing P2X7 receptor downregulates the expression of TCP-1 involved in lymphoma lymphatic metastasis.

    PubMed

    Jiang, Xudong; Mao, Wenjuan; Yang, Ziyi; Zeng, Jia; Zhang, Yi; Song, Yang; Kong, Ying; Ren, Shuangyi; Zuo, Yunfei

    2015-12-08

    P2X7R is an ATP-gated cation channel that participates in cell proliferation and apoptosis. TCP-1 assists with the protein folding. According to our previous research, the P2X7R has a potential role in P388D1 lymphoid neoplasm cells dissemination to peripheral lymph nodes. In order to make a further exploration about the probable mechanism, the lymph nodes which metastasized by P2X7R-silenced P388D1 cells or non-silenced cells were analyzed by 2DE and a MALDI-TOF-based proteomics approach. In the 64 proteins which were differentially expressed between two groups, TCP-1 was found to be significantly decreased in P2X7R shRNA group compared to controls. This correlation was also found in subsequent experiments in vivo and in vitro. The positive correlation between P2X7R and TCP-1 was also proved in both lymphoma and benign lymphadenopathy tissues from patients. It indicates that TCP-1 may be a crucial downstream molecular of P2X7R and plays a novel role in lymphoid neoplasm metastasis.

  11. Protocol for multiple node network

    NASA Technical Reports Server (NTRS)

    Kirkham, Harold (Inventor)

    1994-01-01

    The invention is a multiple interconnected network of intelligent message-repeating remote nodes which employs an antibody recognition message termination process performed by all remote nodes and a remote node polling process performed by other nodes which are master units controlling remote nodes in respective zones of the network assigned to respective master nodes. Each remote node repeats only those messages originated in the local zone, to provide isolation among the master nodes.

  12. Protocol for multiple node network

    NASA Technical Reports Server (NTRS)

    Kirkham, Harold (Inventor)

    1995-01-01

    The invention is a multiple interconnected network of intelligent message-repeating remote nodes which employs an antibody recognition message termination process performed by all remote nodes and a remote node polling process performed by other nodes which are master units controlling remote nodes in respective zones of the network assigned to respective master nodes. Each remote node repeats only those messages originated in the local zone, to provide isolation among the master nodes.

  13. Oxygen diffusion in UO2+x and (U,Pu)O2+-x

    SciTech Connect

    Andersson, Anders D.; Liu, Xiang-Yang

    2012-05-03

    In the first part of this report we revisit an earlier study of oxygen diffusion in UO{sub 2+x}, in which we used density functional theory (DFT) calculations to parameterize a kinetic Monte Carlo (kMC) model. The results from these earlier kMC simulations are reproduced in Fig. 1 and they indicate fairly good agreement with available experiments. This work was later expanded to include a larger temperature range. However, since the publication of this study there have been a number of advancements in DFT methodology for UO{sub 2} and UO{sub 2+x} providing increased accuracy. We have also gained better understanding of the oxygen clustering phenomena occurring in UO{sub 2+x}. For these two reasons, the DFT calculations of the migration barriers of single oxygen interstitials and di-interstitial clusters have been repeated using the LDA+U and GGA+U methodologies. The earlier study used regular GGA and, even though this method captures similar trends as the more advanced LDA+U and GGA+U techniques, it does not fulfill the quantitative requirements set by some applications. Additionally, we have identified a mechanism for the most stable quad-interstitial clusters to migrate and here we calculate the corresponding barriers within both the LDA+U and GGA+U methodologies. The new LDA+U and GGA+U data sets are analyzed in terms of available experiments. In the second part of this report we present initial results for the impact of Pu on oxygen diffusion in UO{sub 2}. The first step in understanding this process is to calculate the binding energies of oxygen vacancies and interstitials to a Pu ion in the UO{sub 2} matrix. Possible diffusion mechanisms are discussed for (U,Pu)O{sub 2-x}, (U,Pu)O{sub 2} and (U,Pu)O{sub 2+x}.

  14. Potent and long-lasting inhibition of human P2X2 receptors by copper

    PubMed Central

    Punthambaker, Sukanya; Hume, Richard I.

    2013-01-01

    P2X receptors are ion channels gated by ATP. In rodents these channels are modulated by zinc and copper. Zinc is co-released with neurotransmitter at some synapses and can modulate neuronal activity, but the role of copper in the brain is unclear. Rat P2X2 receptors show potentiation by 2–100 µM zinc or copper in the presence of a submaximal concentration of ATP but are inhibited by zinc or copper at concentrations above 100 µM. In contrast, human P2X2 (hP2X2) receptors show no potentiation and are strongly inhibited by zinc over the range of 2–100 µM. The effect of copper on hP2X2 is of interest because there are human brain disorders in which copper concentration is altered. We found that hP2X2 receptors are potently inhibited by copper (IC50 = 40 nM). ATP responsiveness recovered extremely slowly after copper washout, with full recovery requiring over 1 h. ATP binding facilitated copper binding but not unbinding from this inhibitory site. A mutant receptor in which the first six extracellular cysteines were deleted, C(1–6)S, showed normal copper inhibition, however reducing agents dramatically accelerated recovery from copper inhibition in wild type hP2X2 and the C(1–6)S mutant, indicating that the final two disulfide bonds are required to maintain the high affinity copper binding site. Three histidine residues required for normal zinc inhibition were also required for normal copper inhibition. Humans with untreated Wilson’s disease have excess amounts of copper in the brain. The high copper sensitivity of hP2X2 receptors suggests that they are non-functional in these patients. PMID:24067922

  15. Intramammary lymph nodes.

    PubMed Central

    Jadusingh, I. H.

    1992-01-01

    AIMS: To determine the prevalence and pathology of intramammary lymph nodes in breast specimens. METHODS: All breast specimens examined by a single pathologist over 70 months in a large teaching hospital were studied retrospectively. All the surgical pathology reports were reviewed. Relevant glass slides from cases in which intramammary lymph nodes were identified were also reexamined. RESULTS: Breast specimens (n = 682) were examined. Seven lymph nodes were found in five patients. The specimens comprised 533 biopsy specimens, 29 segmental resections, 22 reduction mammoplasties, 77 modified radical mastectomies and 20 gynecomastia mastectomies. No clinically relevant microscopical abnormalities were found in four lymph nodes and slight sinus histiocytosis was seen in two nodes. One node contained metastatic adenocarcinoma and benign glandular epithelial inclusions. CONCLUSION: Although rare, intramammary lymph nodes may be detected by careful gross examination of breast specimens even in the absence of clinical identification. They can occur in any quadrant of the breast and can display a variety of pathological conditions. Pathologists should be alert to the existence and potential importance of these lymph nodes. Images PMID:1452776

  16. Sentinel Lymph Node Biopsy

    MedlinePlus

    ... center of the chest (near the breastbone), cancer cells may spread first to lymph nodes inside the chest (under the breastbone) before they can be detected in the axilla. The number of lymph nodes in the axilla varies from person to person but usually ranges from 20 to ...

  17. Theory SkyNode

    NASA Astrophysics Data System (ADS)

    Wagner, Richard P.; Norman, M. L.

    2006-12-01

    A working example of a Basic SkyNode serving theoretical data will be presented. The data is taken from the Simulated Cluster Archive (a set of simulated galaxy clusters, where each cluster was computed using four different physics models). The Theory SkyNode tables contain columns of both computational and observational interest. Examples will be shown of using this theoretical data for comparison to data taken from observational SkyNodes, and vice versa. The relative ease of setting up the Theory SkyNode is of import, as it represents a clear way to present tabular theory data to the Virtual Observatory. Also, the Theory SkyNode provides a prototype for additional "theory catalogs", which wil be created from other simulations. This work is supported by the University of California Office of the President via UCDRD-LLNL award "Scientific Data Management". Travel funding was provided by the US NVO Summer School.

  18. Pattern transfer processes for 157-nm lithography

    NASA Astrophysics Data System (ADS)

    Miyoshi, Seiro; Furukawa, Takamitsu; Watanabe, Hiroyuki; Irie, Shigeo; Itani, Toshiro

    2002-07-01

    We describe and evaluate three kinds of pattern transfer processes that are suitable for 157-nm lithography. These transfer processes are 1) a hard mask (HM) process using SiO as a HM material, 2) a HM process using an organic bottom anti-reflecting coating (BARC)/SiN structure, and 3) a bi- layer process using a silicon-containing resist and an organic film as the bottom layer. In all of these processes, the underlayer fo the resist acts as an anti-reflecting layer. For the HM processes, we patterned a newly developed fluorine-containing resist using a 157-nm microstepper, and transferred the resist patterns to the hard mask by reactive ion etching (RIE) with minimal critical dimension shift. Using the HM pattern, we then fabricated a 65nm Wsi/poly-Si gate pattern using a high-NA microstepper (NA=0.85). With the bi-layer process, we transferred a 60nm 1:1 lines and spaces pattern of a newly developed silicon-containing resist to a 300nm-thick organic film by RIE. The fabrication of a 65nm 1:1 gate pattern and 60nm 1:1 organic film patten clearly demonstrated that 157-nm lithography is the best candidate for fabricating sub-70nm node devices.

  19. Imaging P2X4 receptor subcellular distribution, trafficking, and regulation using P2X4-pHluorin.

    PubMed

    Xu, Ji; Chai, Hua; Ehinger, Konstantin; Egan, Terrance M; Srinivasan, Rahul; Frick, Manfred; Khakh, Baljit S

    2014-07-01

    P2X4 receptors are adenosine triphosphate (ATP)-gated cation channels present on the plasma membrane (PM) and also within intracellular compartments such as vesicles, vacuoles, lamellar bodies (LBs), and lysosomes. P2X4 receptors in microglia are up-regulated in epilepsy and in neuropathic pain; that is to say, their total and/or PM expression levels increase. However, the mechanisms underlying up-regulation of microglial P2X4 receptors remain unclear, in part because it has not been possible to image P2X4 receptor distribution within, or trafficking between, cellular compartments. Here, we report the generation of pH-sensitive fluorescently tagged P2X4 receptors that permit evaluations of cell surface and total receptor pools. Capitalizing on information gained from zebrafish P2X4.1 crystal structures, we designed a series of mouse P2X4 constructs in which a pH-sensitive green fluorescent protein, superecliptic pHluorin (pHluorin), was inserted into nonconserved regions located within flexible loops of the P2X4 receptor extracellular domain. One of these constructs, in which pHluorin was inserted after lysine 122 (P2X4-pHluorin123), functioned like wild-type P2X4 in terms of its peak ATP-evoked responses, macroscopic kinetics, calcium flux, current-voltage relationship, and sensitivity to ATP. P2X4-pHluorin123 also showed pH-dependent fluorescence changes, and was robustly expressed on the membrane and within intracellular compartments. P2X4-pHluorin123 identified cell surface and intracellular fractions of receptors in HEK-293 cells, hippocampal neurons, C8-B4 microglia, and alveolar type II (ATII) cells. Furthermore, it showed that the subcellular fractions of P2X4-pHluorin123 receptors were cell and compartment specific, for example, being larger in hippocampal neuron somata than in C8-B4 cell somata, and larger in C8-B4 microglial processes than in their somata. In ATII cells, P2X4-pHluorin123 showed that P2X4 receptors were secreted onto the PM when LBs

  20. Characterization of protoberberine analogs employed as novel human P2X{sub 7} receptor antagonists

    SciTech Connect

    Lee, Ga Eun; Lee, Won-Gil; Lee, Song-Yi; Lee, Cho-Rong; Park, Chul-Seung; Chang, Sunghoe; Park, Sung-Gyoo; Song, Mi-Ryoung; Kim, Yong-Chul

    2011-04-15

    The P2X{sub 7} receptor (P2X{sub 7}R), a member of the ATP-gated ion channel family, is regarded as a promising target for therapy of immune-related diseases including rheumatoid arthritis and chronic pain. A group of novel protoberberine analogs (compounds 3-5), discovered by screening of chemical libraries, was here investigated with respect to their function as P2X{sub 7}R antagonists. Compounds 3-5 non-competitively inhibited BzATP-induced ethidium ion influx into hP2X{sub 7}-expressing HEK293 cells, with IC{sub 50} values of 100-300 nM. This antagonistic action on the channel further confirmed that both BzATP-induced inward currents and Ca{sup 2+} influx were strongly inhibited by compounds 3-5 in patch-clamp and Ca{sup 2+} influx assays. The antagonists also effectively suppressed downstream signaling of P2X{sub 7} receptors including IL-1{beta} release and phosphorylation of ERK1/2 and p38 proteins in hP2X{sub 7}-expressing HEK293 cells or in differentiated human monocytes (THP-1 cells). Moreover, IL-2 secretion from CD3/CD28-stimulated Jurkat T cell was also dramatically inhibited by the antagonist. These results imply that novel protoberberine analogs may modulate P2X{sub 7} receptor-mediated immune responses by allosteric inhibition of the receptor. - Graphical abstract: Display Omitted

  1. Lymph node culture

    MedlinePlus

    Culture - lymph node ... or viruses grow. This process is called a culture. Sometimes, special stains are also used to identify specific cells or microorganisms before culture results are available. If needle aspiration does not ...

  2. P2X3 Receptors and Sensory Transduction

    NASA Astrophysics Data System (ADS)

    Kennedy, Charles

    It has been known for many years that exogenously administered adenosine 5 -triphosphate (ATP) evokes acute pain, but the physiological and pathophysiological roles of endogenous ATP in nociceptive signalling are only now becoming clear. ATP produces its effects through P2X and P2Y receptors, and the P2X3 receptor is of notable importance. It shows a selective expression, at high levels in nociceptive sensory neurons, where it forms functional receptors on its own and in combination with the P2X2 receptor. Recent studies have used gene knockout methods, antisense oligonucleotides, small interfering RNA technologies, and a novel selective P2X3 antagonist, A-317491, to show that P2X3 receptors play a prominent role in both chronic inflammatory and neuropathic pain. Several other P2X subunits also appear to be expressed in sensory neurons and there is evidence for functional P2X1/5 or P2X2/6 heteromers in some of these. These data indicate that P2X receptors, particularly the P2X3 subtype, could be targetted in the search for new, effective analgesics.

  3. ATP induces P2X7 receptor-independent cytokine and chemokine expression through P2X1 and P2X3 receptors in murine mast cells.

    PubMed

    Bulanova, Elena; Budagian, Vadim; Orinska, Zane; Koch-Nolte, Friedrich; Haag, Friedrich; Bulfone-Paus, Silvia

    2009-04-01

    Extracellular ATP mediates a diverse array of biological responses in many cell types and tissues, including immune cells. We have demonstrated that ATP induces purinergic receptor P2X(7) mediated membrane permeabilization, apoptosis, and cytokine expression in murine mast cells (MCs). Here, we report that MCs deficient in the expression of the P2X(7) receptor are resistant to the ATP-induced membrane permeabilization and apoptosis. However, ATP affects the tyrosine phosphorylation pattern of P2X(7)knockout cells, leading to the activation of ERK1/2. Furthermore, ATP induces expression of several cytokines and chemokines in these cells, including IL-4, IL-6, IFN-gamma, TNF-alpha, RANTES, and MIP-2, at the mRNA level. In addition, the release of IL-6 and IL-13 to cell-conditioned medium was confirmed by ELISA. The ligand selectivity and pharmacological profile indicate the involvement of two P2X family receptors, P2X(1) and P2X(3). Thus, depending on genetic background, particular tissue microenvironment, and ATP concentration, MCs can presumably engage different P2X receptor subtypes, which may result in functionally distinct biological responses to extracellular nucleotides. This finding highlights a novel level of complexity in the sophisticated biology of MCs and may facilitate the development of new therapeutic approaches to modulate MC activities.

  4. Radiation Status of Sub-65 nm Electronics

    NASA Technical Reports Server (NTRS)

    Pellish, Jonathan A.

    2011-01-01

    Ultra-scaled complementary metal oxide semiconductor (CMOS) includes commercial foundry capabilities at and below the 65 nm technology node Radiation evaluations take place using standard products and test characterization vehicles (memories, logic/latch chains, etc.) NEPP focus is two-fold: (1) Conduct early radiation evaluations to ascertain viability for future NASA missions (i.e. leverage commercial technology development). (2) Uncover gaps in current testing methodologies and mechanism comprehension -- early risk mitigation.

  5. The P2X7/P2X4 interaction shapes the purinergic response in murine macrophages.

    PubMed

    Pérez-Flores, Gabriela; Lévesque, Sébastien A; Pacheco, Jonathan; Vaca, Luis; Lacroix, Steve; Pérez-Cornejo, Patricia; Arreola, Jorge

    2015-11-20

    The ATP-gated P2X4 and P2X7 receptors are cation channels, co-expressed in excitable and non-excitable cells and play important roles in pain, bone development, cytokine release and cell death. Although these receptors interact the interacting domains are unknown and the functional consequences of this interaction remain unclear. Here we show by co-immunoprecipitation that P2X4 interacts with the C-terminus of P2X7 and by fluorescence resonance energy transfer experiments that this receptor-receptor interaction is driven by ATP. Furthermore, disrupting the ATP-driven interaction by knocking-out P2X4R provoked an attenuation of P2X7-induced cell death, dye uptake and IL-1β release in macrophages. Thus, P2X7 interacts with P2X4 via its C-terminus and disrupting the P2X7/P2X4 interaction hinders physiological responses in immune cells.

  6. Synthesis, characterization, and photocatalytic activity of TiO(2-x)N(x) nanocatalyst.

    PubMed

    Wang, Y Q; Yu, X J; Sun, D Z

    2007-06-01

    Nitrogen-doped titanium dioxide powders were prepared by wet method, that is, the hydrolysis of acidic tetra-butyl titanate using aqueous ammonia solution, followed by calcination at temperatures about 350 degrees C. The catalysts exhibited photocatalytic activity in the visible light region owing to N-doping. The light absorption onset of TiO(2-x)N(x) was shifted to the visible region at 459 nm compared to 330 nm of pure TiO(2). An obvious decrease in the band gap was observed by the optical absorption spectroscopy, which resulted from N2p localized states above the valence band of TiO(2-x)N(x) (compared to TiO(2)). The TiO(2-x)N(x) catalyst was characterized to be anatase with oxygen-deficient stoichiometry by X-ray diffraction (XRD), surface photovoltage spectroscopy (SPS) and X-ray photoelectron spectroscopy (XPS). The binding energy of N1s measured by XPS characterization was 396.6 eV (TiN bonds, beta-N) and 400.9 eV (NN bonds, gamma-N(2)), respectively. The photocatalytic activity of TiO(2-x)N(x) under visible light was induced by the formation of beta-N in the structure. Photocatalytic decomposition of benzoic acid solutions was carried out in the ultraviolet and visible (UV-vis) light region, and the TiO(2-x)N(x) catalyst showed higher activity than pure TiO(2).

  7. P2X7 Receptors in Neurological and Cardiovascular Disorders

    PubMed Central

    Skaper, Stephen D.; Debetto, Patrizia; Giusti, Pietro

    2009-01-01

    P2X receptors are ATP-gated cation channels that mediate fast excitatory transmission in diverse regions of the brain and spinal cord. Several P2X receptor subtypes, including P2X7, have the unusual property of changing their ion selectivity during prolonged exposure to ATP, which results in a channel pore permeable to molecules as large as 900 daltons. The P2X7 receptor was originally described in cells of hematopoietic origin, and mediates the influx of Ca2+ and Na+ and Ca2+ and Na+ ions as well as the release of proinflammatory cytokines. P2X7 receptors may affect neuronal cell death through their ability to regulate the processing and release of interleukin-1β, a key mediator in neurodegeneration, chronic inflammation, and chronic pain. Activation of P2X7, a key mediator in neurodegeneration, chronic inflammation, and chronic pain. Activation of P2X7 receptors provides an inflammatory stimulus, and P2X7 receptor-deficient mice have substantially attenuated inflammatory responses, including models of neuropathic and chronic inflammatory pain. Moreover, P2X7 receptor activity, by regulating the release of proinflammatory cytokines, may be involved in the pathophysiology of depression. Apoptotic cell death occurs in a number of vascular diseases, including atherosclerosis, restenosis, and hypertension, and may be linked to the release of ATP from endothelial cells, P2X7 receptor activation, proinflammatory cytokine production, and endothelial cell apoptosis. In this context, the P2X7 receptor may be viewed as a gateway of communication between the nervous, immune, and cardiovascular systems. PMID:20029634

  8. Dynamic spin correlations in 'stuffed' spin ice Ho(2+x)Ti(2-x)O(7-d)

    SciTech Connect

    Ehlers, Georg

    2008-02-01

    The magnetic correlations in 'stuffed' spin ice Ho{sub 2+x}Ti{sub 2-x}O{sub 7-{delta}} have been characterized using quasielastic neutron scattering. At temperatures above 1K , these correlations are short ranged in nature and dynamic on a picosecond to nanosecond time scale. As for the case of pure spin ice Ho{sub 2+x}Ti{sub 2-x}O{sub 7}, one can identify, above the freezing temperature, a quantum relaxation regime which is enhanced as it persists to even higher temperatures, T{approx}30-40K , than in the parent compound.

  9. Sub-10 nm nanopantography

    NASA Astrophysics Data System (ADS)

    Tian, Siyuan; Donnelly, Vincent M.; Ruchhoeft, Paul; Economou, Demetre J.

    2015-11-01

    Nanopantography, a massively parallel nanopatterning method over large areas, was previously shown to be capable of printing 10 nm features in silicon, using an array of 1000 nm-diameter electrostatic lenses, fabricated on the substrate, to focus beamlets of a broad area ion beam on selected regions of the substrate. In the present study, using lens dimensional scaling optimized by computer simulation, and reduction in the ion beam image size and energy dispersion, the resolution of nanopantography was dramatically improved, allowing features as small as 3 nm to be etched into Si.

  10. The preparation of nitrogen-doped TiO 2- xN x photocatalyst coated on hollow glass microbeads

    NASA Astrophysics Data System (ADS)

    Shifu, Chen; Xuqiang, Liu; Yunzhang, Liu; Gengyu, Cao

    2007-01-01

    In this paper, the effective method for nitrogen-doped TiO 2- xN x photocatalyst coated on hollow glass microbeads is described, which uses titanium tetraisopropoxide [Ti( iso-OC 3H 7) 4] as the raw materials and gaseous ammonia as a heat treatment atmosphere. The effects of heat treatment temperature and time on the photocatalytic activity of TiO 2- xN x/beads are studied. The photocatalyst is characterized by the UV-vis diffuse reflection spectroscopy, X-ray photoelectron spectroscopy (XPS), X-ray powder diffraction (XRD), Brunauer-Emmett-Teller (BET) analysis and scanning electron microscopy (SEM). The results show that when the TiO 2- xN x/beads is heated at 650 °C for 5 h, the photocatalytic activity of the TiO 2- xN x/beads is the best. Compared with TiO 2, the photoabsorption wavelength range of nitrogen-doped TiO 2- xN x red shifts of about 60 nm, and the photoabsorption intensity increases as well. The photocatalytic activity of the TiO 2- xN x/beads is higher than that of the TiO 2/beads under visible light irradiation. The presence of nitrogen neither influences on the transformation of anatase to rutile, nor creates new crystal phases. When the TiO 2- xN x/beads is heated at 650 °C for 5 h, the amount of nitrogen-doped is 0.53 wt.% in the TiO 2- xN x. As the density of TiO 2- xN x/beads prepared is lower than 1.0 g/cm 3, it may float on water surface and use broader sunlight spectrum directly.

  11. A Dual Role for P2X7 Receptor during Porphyromonas gingivalis Infection

    PubMed Central

    Ramos-Junior, E.S.; Morandini, A.C.; Almeida-da-Silva, C.L.C.; Franco, E.J.; Potempa, J.; Nguyen, K.A.; Oliveira, A.C.; Zamboni, D.S.; Ojcius, D.M.; Scharfstein, J.

    2015-01-01

    Emerging evidence suggests a role for purinergic signaling in the activation of multiprotein intracellular complexes called inflammasomes, which control the release of potent inflammatory cytokines, such as interleukin (IL) -1β and -18. Porphyromonas gingivalis is intimately associated with periodontitis and is currently considered one of the pathogens that can subvert the immune system by limiting the activation of the NLRP3 inflammasome. We recently showed that P. gingivalis can dampen eATP-induced IL-1β secretion by means of its fimbriae in a purinergic P2X7 receptor–dependent manner. Here, we further explore the role of this purinergic receptor during eATP-induced IL-1β processing and secretion by P. gingivalis–infected macrophages. We found that NLRP3 was necessary for eATP-induced IL-1β secretion as well as for caspase 1 activation irrespective of P. gingivalis fimbriae. Additionally, although the secretion of IL-1β from P. gingivalis–infected macrophages was dependent on NLRP3, its adaptor protein ASC, or caspase 1, the cleavage of intracellular pro-IL-1β to the mature form was found to occur independently of NLRP3, its adaptor protein ASC, or caspase 1. Our in vitro findings revealed that P2X7 receptor has a dual role, being critical not only for eATP-induced IL-1β secretion but also for intracellular pro-IL-1β processing. These results were relevant in vivo since P2X7 receptor expression was upregulated in a P. gingivalis oral infection model, and reduced IFN-γ and IL-17 were detected in draining lymph node cells from P2rx7-/- mice. Furthermore, we demonstrated that P2X7 receptor and NLRP3 transcription were modulated in human chronic periodontitis. Overall, we conclude that the P2X7 receptor has a role in periodontal immunopathogenesis and suggest that targeting of the P2X7/NLRP3 pathway should be considered in future therapeutic interventions in periodontitis. PMID:26152185

  12. Decavanadate, a P2X receptor antagonist, and its use to study ligand interactions with P2X7 receptors.

    PubMed

    Michel, Anton D; Xing, Mengle; Thompson, Kyla M; Jones, Clare A; Humphrey, Patrick P A

    2006-03-18

    In this study we have studied decavanadate effects at P2X receptors. Decavanadate competitively blocked 2'- and 3'-O-(4benzoylbenzoyl) ATP (BzATP) stimulated ethidium accumulation in HEK293 cells expressing human recombinant P2X7 receptors (pK(B) 7.5). The effects of decavanadate were rapid (minutes) in both onset and offset and contrasted with the much slower kinetics of pyridoxal 5-phosphate (P5P), Coomassie brilliant blue (CBB) and 1-[N,O-bis(5-isoquinolinesulfonyl)-N-methyl-L-tyrosyl]-4-phenylpiperazine (KN62). Decavanadate competitively blocked the slowly reversible, or irreversible, blockade of the P2X7 receptor produced by P5P and oxidised ATP suggesting competition for a common binding site. However, the interaction between decavanadate and KN62 was non-competitive. Decavanadate also blocked P2X2 and P2X4 receptors but with slightly lower potency. These data demonstrate that decavanadate is the first reversible and competitive antagonist of the P2X7 receptor and is a useful tool for studying the mechanism of interaction of ligands with the P2X7 receptor.

  13. J-2X Engine Test, May 16, 2012

    NASA Video Gallery

    The shake, rattle and roar lasted just seven seconds, but the short J-2X test conducted May 16 at NASA's John C. Stennis Space Center moved the space agency closer to a return to deep space. NASA o...

  14. Successful First J-2X Combustion Stability Test

    NASA Video Gallery

    NASA conducted a key stability test firing of the J-2X rocket engine Dec. 1, marking another step forward in development of the upper-stage engine that will carry humans farther into space than eve...

  15. Throttle Up! J-2X Powerpack Test Sets Record

    NASA Video Gallery

    During a record-breaking June 8 test, engineers throttled the J-2X powerpack up and down several times to explore numerous operating points required for the fuel and oxidizer turbopumps. The result...

  16. J-2X Nozzle Extension Goes the Distance

    NASA Video Gallery

    NASA engineers conducted a 550-second test of the new J-2X rocket engine at Stennis Space Center in Mississippi on July 13. The test, conducted on the A-2 Test Stand, continued a series of firings ...

  17. J-2X Test Articles Using FDM Process

    NASA Technical Reports Server (NTRS)

    Anderson, Ted; Ruf, Joe; Steele, Phil

    2010-01-01

    This viewgraph presentation gives a brief history of the J-2X engine, along with detailed description of the material demonstrator and test articles that were created using Fused Deposition Modeling (FDM) process.

  18. J-2X Engine Ready For Second Test Series

    NASA Video Gallery

    Time-lapse video of the installation of J-2X engine 10001 in the A-2 test-stand at Stennis, complete with clamshell assembly and nozzle extension. With these enhancements test engineers will measur...

  19. J-2X Rocket Engine, 40-Second Test

    NASA Video Gallery

    NASA conducted a 40-second test of the J-2X rocket engine Sept. 28, the most recent in a series of tests of the next-generation engine selected as part of the Space Launch System architecture that ...

  20. J-2X Powerpack Test, July 24, 2012

    NASA Video Gallery

    NASA engineers surpassed their previously set J-2X powerpack record at Stennis's Test Complex A with a 1,350-second test on July 24. In this video there are three aspects featured:the outside test ...

  1. Start Me Up! J-2X Rocket Test

    NASA Video Gallery

    NASA engineers conducted the first in a new round of tests on the next-generation J-2X rocket engine Feb. 15 at Stennis Space Center. The 35-second test continued progress in development of the eng...

  2. J-2X Engine Continues to Set Standards

    NASA Video Gallery

    Testing of the next-generation J-2X rocket engine continues to set standards. Last fall, the engine attained 100 percent power in just its fourth test and became the fastest U.S. rocket engine to a...

  3. J-2X Engine 'Goes the Distance' at Stennis

    NASA Video Gallery

    J-2X rocket engine testing continues at NASA's Stennis Space Center in Mississippi with the second in a series of tests conducted on Feb. 27. The 550-second, full-duration test provided critical in...

  4. Close Encounter With 'Fired Up' J-2X Engine

    NASA Video Gallery

    This video shows a spillway view of the 550-second, full-duration test of the J-2X engine on Feb. 27 at Stennis Space Center in Mississippi. Data from the test will provide critical information abo...

  5. J-2X Engine Test Goes Full Duration

    NASA Video Gallery

    NASA conducted a 260-second J-2X engine test at the Stennis Space Center in southern Mississippi on June 13 marking another step in developing the Space Launch System, the next-generation rocket th...

  6. J-2X Powerpack Test Lights Up the Sky

    NASA Video Gallery

    A burst of flame from a J-2X Powerpack test-firing lights up the sky on Dec. 5, 2012 at NASA's Stennis Space Center in Mississippi. For the first time, the Space Launch System team invited Twitter ...

  7. Helium release and microstructural changes in Er(D,T)2-x3Hex films).

    SciTech Connect

    Gelles, D. S.; Browning, James Frederick; Snow, Clark Sheldon; Banks, James Clifford; Mangan, Michael A.; Rodriguez, Mark Andrew; Brewer, Luke N.; Kotula, Paul Gabriel

    2007-12-01

    Er(D,T){sub 2-x} {sup 3}He{sub x}, erbium di-tritide, films of thicknesses 500 nm, 400 nm, 300 nm, 200 nm, and 100 nm were grown and analyzed by Transmission Electron Microscopy, X-Ray Diffraction, and Ion Beam Analysis to determine variations in film microstructure as a function of film thickness and age, due to the time-dependent build-up of {sup 3}He in the film from the radioactive decay of tritium. Several interesting features were observed: One, the amount of helium released as a function of film thickness is relatively constant. This suggests that the helium is being released only from the near surface region and that the helium is not diffusing to the surface from the bulk of the film. Two, lenticular helium bubbles are observed as a result of the radioactive decay of tritium into {sup 3}He. These bubbles grow along the [111] crystallographic direction. Three, a helium bubble free zone, or 'denuded zone' is observed near the surface. The size of this region is independent of film thickness. Four, an analysis of secondary diffraction spots in the Transmission Electron Microscopy study indicate that small erbium oxide precipitates, 5-10 nm in size, exist throughout the film. Further, all of the films had large erbium oxide inclusions, in many cases these inclusions span the depth of the film.

  8. Electron-induced single event upsets in 28 nm and 45 nm bulk SRAMs

    DOE PAGES

    Trippe, J. M.; Reed, R. A.; Austin, R. A.; ...

    2015-12-01

    In this study, we present experimental evidence of single electron-induced upsets in commercial 28 nm and 45 nm CMOS SRAMs from a monoenergetic electron beam. Upsets were observed in both technology nodes when the SRAM was operated in a low power state. The experimental cross section depends strongly on both bias and technology node feature size, consistent with previous work in which SRAMs were irradiated with low energy muons and protons. Accompanying simulations demonstrate that δ-rays produced by the primary electrons are responsible for the observed upsets. Additional simulations predict the on-orbit event rates for various Earth and Jovian environmentsmore » for a set of sensitive volumes representative of current technology nodes. The electron contribution to the total upset rate for Earth environments is significant for critical charges as high as 0.2 fC. This value is comparable to that of sub-22 nm bulk SRAMs. Similarly, for the Jovian environment, the electron-induced upset rate is larger than the proton-induced upset rate for critical charges as high as 0.3 fC.« less

  9. Electron-induced single event upsets in 28 nm and 45 nm bulk SRAMs

    SciTech Connect

    Trippe, J. M.; Reed, R. A.; Austin, R. A.; Sierawski, B. D.; Weller, R. A.; Funkhouser, E. D.; King, M. P.; Narasimham, B.; Bartz, B.; Baumann, R.; Schrimpf, R. D.; Labello, R.; Nichols, J.; Weeden-Wright, S. L.

    2015-12-01

    In this study, we present experimental evidence of single electron-induced upsets in commercial 28 nm and 45 nm CMOS SRAMs from a monoenergetic electron beam. Upsets were observed in both technology nodes when the SRAM was operated in a low power state. The experimental cross section depends strongly on both bias and technology node feature size, consistent with previous work in which SRAMs were irradiated with low energy muons and protons. Accompanying simulations demonstrate that δ-rays produced by the primary electrons are responsible for the observed upsets. Additional simulations predict the on-orbit event rates for various Earth and Jovian environments for a set of sensitive volumes representative of current technology nodes. The electron contribution to the total upset rate for Earth environments is significant for critical charges as high as 0.2 fC. This value is comparable to that of sub-22 nm bulk SRAMs. Similarly, for the Jovian environment, the electron-induced upset rate is larger than the proton-induced upset rate for critical charges as high as 0.3 fC.

  10. Crystal structure, phase transition and conductivity study of two new organic - inorganic hybrids: [(CH2)7(NH3)2]X2, X = Cl/Br

    NASA Astrophysics Data System (ADS)

    Mostafa, Mohga Farid; El-khiyami, Shimaa Said; Abd-Elal, Seham Kamal

    2017-01-01

    Two hybrids 1,7-heptanediammonium di-halide, [(C7H20N2]X2,X = Cl/Br crystallize in monoclinic P21/c, Z = 4. [(C7H20N2]Cl2: a = 4.7838 (2) Å, b = 16.9879 (8) Å, c = 13.9476 (8) Å, β = 97.773 (2)°, V = 1203.58(10) Å3, D = 1.137 g/cm3, λ = 0.71073 Å, R = 0.052 for 1055 reflections with I > 2σ(I), T = 298(2) K. [(C7H20N2]Br2: a = 4.7952 (10) Å, b = 16.9740 (5) Å, c = 13.9281 (5) Å, β = 97.793 (2)°, V = 1203.83(6) Å3, D = 1.612 g/cm3, λ = 0.71073 Å, R = 0.03 for 1959 reflections with I > 2σ(I) T = 298(2) K. Asymmetric unit cell of [(C7H20N2]X2,X = Cl/Br, each consist of one heptane-1,7-diammonium cation and two halide anions. The organic hydrocarbon layers pack in a stacked herring-bone manner, hydrogen bonded to the halide ions. Lattice potential energy is 1568.59 kJ/mol and 1560.78 kJ/mol, and cation molar volumes are 0.295 nm3 and 0.300 nm3 for chloride and bromide respectively. DTA confirmed chain melting transitions for both hybrids below T ∼ 340 K. Dielectric and ac conductivity measurements (290 < T K < 410; 0.080 < f kHz<100) indicated higher conductivity and activation energy of bromide for T > 340 K. Cross over from Jonscher's universal dielectric response at low temperatures T < 340 K to super-linear power law for T > 340 K is observed. At high temperatures halide ion hopping in accordance with the jump relaxation model prevails.

  11. La2-xSrxCuO4 superconductor nanowire devices

    DOE PAGES

    Litombe, N. E.; Bollinger, A. T.; Hoffman, J. E.; ...

    2014-07-02

    La2-xSrxCuO₄ nanowire devices have been fabricated and characterized using electrical transport measurements. In addition, nanowires with widths down to 80 nm are patterned using high-resolution electron beam lithography. However, the narrowest nanowires show incomplete superconducting transitions with some residual resistance at T = 4 K. Here, we report on refinement of the fabrication process to achieve narrower nanowire devices with complete superconducting transitions, opening the path to the study of novel physics arising from dimension-limited superconductivity on the nanoscale.

  12. P2X7 receptors stimulate AKT phosphorylation in astrocytes

    PubMed Central

    Jacques-Silva, Maria C; Rodnight, Richard; Lenz, Guido; Liao, Zhongji; Kong, Qiongman; Tran, Minh; Kang, Yuan; Gonzalez, Fernando A; Weisman, Gary A; Neary, Joseph T

    2004-01-01

    Emerging evidence indicates that nucleotide receptors are widely expressed in the nervous system. Here, we present evidence that P2Y and P2X receptors, particularly the P2X7 subtype, are coupled to the phosphoinositide 3-kinase (PI3K)/Akt pathway in astrocytes. P2Y and P2X receptor agonists ATP, uridine 5′-triphosphate (UTP) and 2′,3′-O-(4-benzoyl)-benzoyl ATP (BzATP) stimulated Akt phosphorylation in primary cultures of rat cortical astrocytes. BzATP induced Akt phosphorylation in a concentration- and time-dependent manner, similar to the effect of BzATP on Akt phosphorylation in 1321N1 astrocytoma cells stably transfected with the rat P2X7 receptor. Activation was maximal at 5 – 10 min and was sustained for 60 min; the EC50 for BzATP was approximately 50 μM. In rat cortical astrocytes, the positive effect of BzATP on Akt phosphorylation was independent of glutamate release. The effect of BzATP on Akt phosphorylation in rat cortical astrocytes was significantly reduced by the P2X7 receptor antagonist Brilliant Blue G and the P2X receptor antagonist iso-pyridoxal-5′-phosphate-6-azophenyl-2′,4′-disulfonic acid, but was unaffected by trinitrophenyl-ATP, oxidized ATP, suramin and reactive blue 2. Results with specific inhibitors of signal transduction pathways suggest that extracellular and intracellular calcium, PI3K and a Src family kinase are involved in the BzATP-induced Akt phosphorylation pathway. In conclusion, our data indicate that stimulation of astrocytic P2X7 receptors, as well as other P2 receptors, leads to Akt activation. Thus, signaling by nucleotide receptors in astrocytes may be important in several cellular downstream effects related to the Akt pathway, such as cell cycle and apoptosis regulation, protein synthesis, differentiation and glucose metabolism. PMID:15023862

  13. Albuquerque, NM, USA

    NASA Technical Reports Server (NTRS)

    1991-01-01

    Albuquerque, NM (35.0N, 106.5W) is situated on the edge of the Rio Grande River and flood plain which cuts across the image. The reddish brown surface of the Albuquerque Basin is a fault depression filled with ancient alluvial fan and lake bed sediments. On the slopes of the Manzano Mountains to the east of Albuquerque, juniper and other timber of the Cibola National Forest can be seen as contrasting dark tones of vegetation.

  14. A Feasibility Study of 50 nm Resolution with Low Energy Electron Beam Proximity Projection Lithography

    NASA Astrophysics Data System (ADS)

    Yoshizawa, Masaki; Savas, T. A.

    2002-01-01

    Patterns of 50 nm lines and spaces were demonstrated by low energy electron beam proximity lithography using 47-nm-thick poly methyl methacrylate (PMMA) and stencil masks fabricated by achromatic interference lithography (AIL). The result indicates the validity of the resolution analysis previously reported and the resolution capabilities of low energy electron beam proximity projection lithography (LEEPL) as a 50 nm node technology.

  15. Chemical pressure induced change in multiferroicity of Bi1+2xGd2x/2Fe1-2xO3 bulk ceramics

    NASA Astrophysics Data System (ADS)

    Pradhan, S. K.; Sahu, D. R.; Rout, P. P.; Das, S. K.; Pradhan, A. K.; Srinivasu, V. V.; Roul, B. K.

    2017-04-01

    We have optimized Gd ion substitution in BiFeO3 (BFO) and observed prominently change in structural, electrical and magnetic behavior of Bi1+2xGd2x/2Fe1-2xO3 ceramics synthesized through slow step sintering schedule. It is observed that with the increase in concentration of Gd (x=0.1), original structure of BFO is transformed from rhombohedral R3c space group to orthorhombic Pn21a space group. Surprisingly, unit cell volume is drastically contracted (35% for x=0.2) and the sintered specimen showed enhanced room temperature ferromagnetic behavior although the original BFO is normally G-type antiferromagnetic in nature at 643 K. It is expected that intrinsic chemical pressure within the bulk body built by the substitution of Gd in presence of excess bismuth greatly supported through unidirectional movement of electrical dipole moment with in each individual domain as a result of which suppression of leakage current with enhanced dielectric and ferroelectric hysteresis is observed.

  16. Synthesis of Ultrathin and Thickness-Controlled Cu2-xSe Nanosheets via Cation Exchange.

    PubMed

    Wang, Yuanxing; Zhukovskyi, Maksym; Tongying, Pornthip; Tian, Yang; Kuno, Masaru

    2014-11-06

    We demonstrate the use of cation exchange to synthesize ultrathin and thickness-controlled Cu2-xSe nanosheets (NSs) beginning with CdSe NSs. In this manner, extremely thin (i.e., 1.6 nm thickness) Cu2-xSe NSs, beyond which can be made directly, have been obtained. Furthermore, they represent the thinnest NSs produced via cation exchange. Notably, the exchange reaction preserves the starting morphology of the CdSe sheets and also retains their cubic crystal structure. The resulting nonstoichiometric and cubic Cu2-xSe NSs are stable and do not exhibit any signs of Cu or Se oxidation after exposure to air for 2 weeks. Resulting NSs also show the existence of a localized surface plasmon resonance in the infrared due to the presence of copper vacancies. Efforts to isolate intermediates during the cation exchange reaction show that it occurs via a mechanism where entire sheets are rapidly converted into the final product once the exchange reaction commences, precluding the isolation of alloyed species.

  17. Charge distribution and oxygen diffusion in hyperstoichiometric uranium dioxide UO2+x (x≤0.25)

    SciTech Connect

    Skomurski, Frances N.; Wang, Jianwei; Ewing, Rodney C.; Becker, U.

    2013-03-03

    Quantum-mechanical techniques were used to determine the charge distribution of uranium atoms in UO2+x (x ≤ 0.25) and to calculate activation-energy barriers to oxygen diffusion. Upon optimization, the reduction in unit-cell volume relative to UO2, and the shortest and bond-lengths (0.22 and 0.24 nm, respectively) are in good agreement with experimental data. The addition of interstitial oxygen to the unoccupied cubic sites in the UO2 structure deflects two nearest-neighbor oxygen atoms along the body diagonal of uranium-occupied cubic sites, creating lattice oxygen defects. In (1×1×2) supercells, the partial oxidation of two U4+ atoms is observed for every interstitial oxygen added to the structure, consistent with previous quantum-mechanical studies. Results favor the stabilization of two U5+ over one U6+ in UO2+x. Calculated activation energies (2.06-2.73 eV) and diffusion rates for oxygen in UO2+x support the idea that defect clusters likely play an increasingly important role as oxidation proceeds.

  18. Upconversion luminescence in CaYb2-xErxGe3O10 (x = 0-2)

    NASA Astrophysics Data System (ADS)

    Lipina, Olga A.; Surat, Ludmila L.; Tyutyunnik, Alexander P.; Zubkov, Vladimir G.

    2016-11-01

    A new series of CaYb2-xErxGe3O10 (x = 0-2) germanates has been prepared by conventional solid state reaction and an EDTA-assisted precursor route. Strong upconversion luminescence has been detected under 980 nm diode laser excitation. Concentration dependencies study shows that the highest intensity of the lines around 408 nm (2H9/2 → 4I15/2), 524 nm (2H11/2 → 4I15/2), 548 nm (4S3/2 → 4I15/2) and 659 nm (4F9/2 → 4I15/2) is observed for the sample x = 0.2 prepared by the precursor method. The measured quantum yield for this compound is more than 3%. Possible mechanisms of energy transfer between active centers have been also proposed.

  19. Checking 2xM quantum separability via semidefinite programming

    SciTech Connect

    Woerdeman, Hugo J.

    2003-01-01

    In this paper, we propose a sequence of tests which give a definitive test for checking 2xM separability. The test is definitive in the sense that each test corresponds to checking membership in a cone, and that the closure of the union of all these cones consists exactly of all 2xM separable states. Membership in each single cone may be checked via semidefinite programming, and is thus a tractable problem. This sequential test comes about by considering the dual problem, the characterization of all positive maps acting C{sup 2x2}{yields}C{sup MxM}. The latter in turn is solved by characterizing all positive quadratic matrix polynomials in a complex variable.

  20. Testing for the J-2X Upper Stage Engine

    NASA Technical Reports Server (NTRS)

    Buzzell, James C.

    2010-01-01

    NASA selected the J-2X Upper Stage Engine in 2006 to power the upper stages of the Ares I crew launch vehicle and the Ares V cargo launch vehicle. Based on the proven Saturn J-2 engine, this new engine will provide 294,000 pounds of thrust and a specific impulse of 448 seconds, making it the most efficient gas generator cycle engine in history. The engine's guiding philosophy emerged from the Exploration Systems Architecture Study (ESAS) in 2005. Goals established then called for vehicles and components based, where feasible, on proven hardware from the Space Shuttle, commercial, and other programs, to perform the mission and provide an order of magnitude greater safety. Since that time, the team has made unprecedented progress. Ahead of the other elements of the Constellation Program architecture, the team has progressed through System Requirements Review (SRR), System Design Review (SDR), Preliminary Design Review (PDR), and Critical Design Review (CDR). As of February 2010, more than 100,000 development engine parts have been ordered and more than 18,000 delivered. Approximately 1,300 of more than 1,600 engine drawings were released for manufacturing. A major factor in the J-2X development approach to this point is testing operations of heritage J-2 engine hardware and new J-2X components to understand heritage performance, validate computer modeling of development components, mitigate risk early in development, and inform design trades. This testing has been performed both by NASA and its J-2X prime contractor, Pratt & Whitney Rocketdyne (PWR). This body of work increases the likelihood of success as the team prepares for testing the J-2X powerpack and first development engine in calendar 2011. This paper will provide highlights of J-2X testing operations, engine test facilities, development hardware, and plans.

  1. Witnessing quantum discord in 2xN systems

    SciTech Connect

    Bylicka, Bogna; Chruscinski, Dariusz

    2010-06-15

    Bipartite states with vanishing quantum discord are necessarily separable and hence positive partial transpose (PPT). We show that 2xN states satisfy additional property: the positivity of their partial transposition is recognized with respect to the canonical factorization of the original density operator. We call such states strong PPT (SPPT). Therefore, we provide a natural witness for a quantum discord: if a 2xN state is not SPPT it must contain nonclassical correlations measured by quantum discord. It is an analog of the celebrated Peres-Horodecki criterion: if a state is not PPT it must be entangled.

  2. Maltodextrin and fat preference deficits in "taste-blind" P2X2/P2X3 knockout mice.

    PubMed

    Sclafani, Anthony; Ackroff, Karen

    2014-07-01

    Adenosine triphosphate is a critical neurotransmitter in the gustatory response to the 5 primary tastes in mice. Genetic deletion of the purinergic P2X2/P2X3 receptor greatly reduces the neural and behavioral response to prototypical primary taste stimuli. In this study, we examined the behavioral response of P2X double knockout mice to maltodextrin and fat stimuli, which appear to activate additional taste channels. P2X double knockout and wild-type mice were given 24-h choice tests (vs. water) with ascending concentrations of Polycose and Intralipid. In Experiment 1, naive double knockout mice, unlike wild-type mice, were indifferent to dilute (0.5-4%) Polycose solutions but preferred concentrated (8-32%) Polycose to water. In a retest, the Polycose-experienced double knockout mice, like wild-type mice, preferred all Polycose concentrations. In Experiment 2, naive double knockout mice, unlike wild-type mice, were indifferent to dilute (0.313-2.5%) Intralipid emulsions but preferred concentrated (5-20%) Intralipid to water. In a retest, the fat-experienced double knockout mice, like wild-type mice, strongly preferred 0.313-5% Intralipid to water. These results indicate that the inherent preferences of mice for maltodextrin and fat are dependent upon adenosine triphosphate taste cell signaling. With experience, however, P2X double knockout mice develop strong preferences for the nontaste flavor qualities of maltodextrin and fat conditioned by the postoral actions of these nutrients.

  3. Credit WCT. Original 2'" x 2'" color negative is housed ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    Credit WCT. Original 2-'" x 2-'" color negative is housed in the JPL Photography Laboratory, Pasadena, California. View shows small autoclave demonstrated by JPL staff member Milton Clay (JPL negative no. JPL-10286AC, 27 January 1989). - Jet Propulsion Laboratory Edwards Facility, Liner Laboratory, Edwards Air Force Base, Boron, Kern County, CA

  4. The P2X7 Receptor-Interleukin-1 Liaison

    PubMed Central

    Giuliani, Anna Lisa; Sarti, Alba C.; Falzoni, Simonetta; Di Virgilio, Francesco

    2017-01-01

    Interleukin-1β (IL-1β) plays a central role in stimulation of innate immune system and inflammation and in several chronic inflammatory diseases. These include rare hereditary conditions, e.g., auto-inflammatory syndromes, as well as common pathologies, such as type II diabetes, gout and atherosclerosis. A better understanding of IL-1β synthesis and release is particularly relevant for the design of novel anti-inflammatory drugs. One of the molecules mainly involved in IL-1β maturation is the P2X7 receptor (P2X7R), an ATP-gated ion channel that chiefly acts through the recruitment of the NLRP3 inflammasome-caspase-1 complex. In this review, we will summarize evidence supporting the key role of the P2X7R in IL-1β production, with special emphasis on the mechanism of release, a process that is still a matter of controversy. Four different models have been proposed: (i) exocytosis via secretory lysosomes, (ii) microvesicles shedding from plasma membrane, (iii) release of exosomes, and (iv) passive efflux across a leaky plasma membrane during pyroptotic cell death. All these models involve the P2X7R. PMID:28360855

  5. Testing and Functions of the J2X Gas Generator

    NASA Technical Reports Server (NTRS)

    Miller, Nicholas

    2009-01-01

    The Ares I, NASA s new solid rocket based crew launch vehicle, is a two stage in line rocket that has made its waytothe forefront of NASA s endeavors. The Ares I s Upper Stage (US) will be propelled by a J-2X engine which is fueled by liquid hydrogen and liquid oxygen. The J-2X is a variation based on two of its predecessor s, the J-2 and J-2S engines. ET50 is providing the design support for hardware required to run tests on the J-2X Gas Generator (GG) that increases the delivery pressure of the supplied combustion fuels that the engine burns. The test area will be running a series of tests using different lengths and curved segments of pipe and different sized nozzles to determine the configuration that best satisfies the thrust, heat, and stability requirements for the engine. I have had to research the configurations that are being tested and gain an understanding of the purpose of the tests. I then had to research the parts that would be used in the test configurations. I was taken to see parts similar to the ones used in the test configurations and was allowed to review drawings and dimensions used for those parts. My job over this summer has been to use the knowledge I have gained to design, model, and create drawings for the un-fabricated parts that are necessary for the J-2X Workhorse Gas Generator Phase IIcTest.

  6. Credit WCT. Original 2'" x 2%" color negative is housed ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    Credit WCT. Original 2-'" x 2-%" color negative is housed in the JPL Photography Laboratory, Pasadena, California. This view shows the propellant cutter as it was originally installed (JPL negative no. 381-2274A, 29 June 1962) - Jet Propulsion Laboratory Edwards Facility, Preparation Building, Edwards Air Force Base, Boron, Kern County, CA

  7. J-2X Powerpack Test Lights Up the Night

    NASA Video Gallery

    In a brief but dazzling display, a 1.86-second burst of flame emerges from the A-1 test stand at Stennis Space Center as NASA kicks off the first in a series of J-2X powerpack tests the evening of ...

  8. Quadrupole Order in the Frustrated Pyrochlore Tb2 +xTi2 -xO7 +y

    NASA Astrophysics Data System (ADS)

    Takatsu, H.; Onoda, S.; Kittaka, S.; Kasahara, A.; Kono, Y.; Sakakibara, T.; Kato, Y.; Fâk, B.; Ollivier, J.; Lynn, J. W.; Taniguchi, T.; Wakita, M.; Kadowaki, H.

    2016-05-01

    A hidden order that emerges in the frustrated pyrochlore Tb2 +xTi2 -xO7 +y with Tc=0.53 K is studied using specific heat, magnetization, and neutron scattering experiments on a high-quality single crystal. Semiquantitative analyses based on a pseudospin-1 /2 Hamiltonian for ionic non-Kramers magnetic doublets demonstrate that it is an ordered state of electric quadrupole moments. The elusive spin liquid state of the nominal Tb2 Ti2 O7 is most likely a U (1 ) quantum spin-liquid state.

  9. A robust 45 nm gate-length CMOSFET for 90 nm Hi-speed technology

    NASA Astrophysics Data System (ADS)

    Lim, K. Y.; Chan, V.; Rengarajan, R.; Lee, H. K.; Rovedo, N.; Lim, E. H.; Yang, S.; Jamin, F.; Nguyen, P.; Lin, W.; Lai, C. W.; Teh, Y. W.; Lee, J.; Kim, L.; Luo, Z.; Ng, H.; Sudijono, J.; Wann, C.; Yang, I.

    2006-04-01

    We have developed a robust 45 nm gate-length CMOSFET for 90 nm node high performance application. Aggressive gate length and gate dielectric scaling along with optimized strain engineering enable high performance device similar to 65 nm node CMOSFET [Nakahara Y, et al. IEDM Tech Dig 2003;281] We have utilized oxy-nitride gate with post-nitridation anneal, high ramp rate spike anneal, low temperature spacer scheme and stress controlled SiN contact etch stop liner process in order to improve drive current as well as transistor short-channel roll-off. In particular, we will focus on the study of middle-of-line (MOL) process parameters, (i.e. MOL thermal expense and mechanical stress from contact etch stop liner) on transistor performance and reliability. Based on the study, we have obtained device exhibit drive-current of 900/485 μA/μm for NMOSFET and PMOSFET, respectively, at standard supply voltage of 1 V.

  10. Thermoelectric properties of Mg2X (X = Si, Ge) based bulk and quantum well systems

    NASA Astrophysics Data System (ADS)

    Yelgel, Övgü Ceyda

    2017-01-01

    Mg2X (X = Si, Ge) compounds are promising thermoelectric materials for middle temperature applications due to good thermoelectric properties, nontoxicity, and abundantly available constituent elements. So far, these materials used in applications have all been in bulk form. Herein we report a full theory of thermoelectric transport properties of 3D bulk and 2D quantum well systems. The main aim of this present work is to show the effect of quantum confinement on the enhancement of the thermoelectric figure of merit theoretically. Results are given for n-type Mg2 Si0.5 Ge0.5 solid solutions and n-type Mg2Si/Mg2Ge/Mg2Si quantum well systems where the values of well widths are taken as 10 nm, 15 nm, and 20 nm, respectively. The n-type doping is made by using Sb- and La-elements as dopants. Experimental results for solid solutions are included to provide demonstration of proof of principle for the theoretical model applied for 3D bulk structures. The maximum thermoelectric figure of merits of Lax Mg2 -x Si0.49 Ge0.5 Sb0.01 solid solutions are obtained to be 0.64 and 0.56 at 800 K for x = 0 and x = 0.01 sample, respectively. While, at the same temperature, due to the relatively low phonon thermal conductivity the state-of-the-art ZT values of 2.41 and 2.26 have been attained in the Mg2Si/Mg2Ge/Mg2Si quantum well samples with 0.01 wt. % Sb-doped and 0.01 wt. % Sb- and 0.01 wt. % La-doped, respectively.

  11. Effect of P2X4 and P2X7 receptor antagonism on the pressure diuresis relationship in rats

    PubMed Central

    Menzies, Robert I.; Unwin, Robert J.; Dash, Ranjan K.; Beard, Daniel A.; Cowley Jr., Allen W.; Carlson, Brian E.; Mullins, John J.; Bailey, Matthew A.

    2013-01-01

    Reduced glomerular filtration, hypertension and renal microvascular injury are hallmarks of chronic kidney disease, which has a global prevalence of ~10%. We have shown previously that the Fischer (F344) rat has lower GFR than the Lewis rat, and is more susceptible to renal injury induced by hypertension. In the early stages this injury is limited to the pre-glomerular vasculature. We hypothesized that poor renal hemodynamic function and vulnerability to vascular injury are causally linked and genetically determined. In the present study, normotensive F344 rats had a blunted pressure diuresis relationship, compared with Lewis rats. A kidney microarray was then interrogated using the Endeavour enrichment tool to rank candidate genes for impaired blood pressure control. Two novel candidate genes, P2rx7 and P2rx4, were identified, having a 7− and 3− fold increased expression in F344 rats. Immunohistochemistry localized P2X4 and P2X7 receptor expression to the endothelium of the pre-glomerular vasculature. Expression of both receptors was also found in the renal tubule; however there was no difference in expression profile between strains. Brilliant Blue G (BBG), a relatively selective P2X7 antagonist suitable for use in vivo, was administered to both rat strains. In Lewis rats, BBG had no effect on blood pressure, but increased renal vascular resistance, consistent with inhibition of some basal vasodilatory tone. In F344 rats BBG caused a significant reduction in blood pressure and a decrease in renal vascular resistance, suggesting that P2X7 receptor activation may enhance vasoconstrictor tone in this rat strain. BBG also reduced the pressure diuresis threshold in F344 rats, but did not alter its slope. These preliminary findings suggest a physiological and potential pathophysiological role for P2X7 in controlling renal and/or systemic vascular function, which could in turn affect susceptibility to hypertension-related kidney damage. PMID:24187541

  12. Functional properties of five Dictyostelium discoideum P2X receptors.

    PubMed

    Baines, Abigail; Parkinson, Katie; Sim, Joan A; Bragg, Laricia; Thompson, Christopher R L; North, R Alan

    2013-07-19

    The Dictyostelium discoideum genome encodes five proteins that share weak sequence similarity with vertebrate P2X receptors. Unlike vertebrate P2X receptors, these proteins are not expressed on the surface of cells, but populate the tubules and bladders of the contractile vacuole. In this study, we expressed humanized cDNAs of P2XA, P2XB, P2XC, P2XD, and P2XE in human embryonic kidney cells and altered the ionic and proton environment in an attempt to reflect the situation in amoeba. Recording of whole-cell membrane currents showed that four receptors operated as ATP-gated channels (P2XA, P2XB, P2XD, and P2XE). At P2XA receptors, ATP was the only effective agonist of 17 structurally related putative ligands that were tested. Extracellular sodium, compared with potassium, strongly inhibited ATP responses in P2XB, P2XD, and P2XE receptors. Increasing the proton concentration (pH 6.2) accelerated desensitization at P2XA receptors and decreased currents at P2XD receptors, but increased the currents at P2XB and P2XE receptors. Dictyostelium lacking P2XA receptors showed impaired regulatory volume decrease in hypotonic solution. This phenotype was readily rescued by overexpression of P2XA and P2XD receptors, partially rescued by P2XB and P2XE receptors, and not rescued by P2XC receptors. The failure of the nonfunctional receptor P2XC to restore the regulatory volume decrease highlights the importance of ATP activation of P2X receptors for a normal response to hypo-osmotic shock, and the weak rescue by P2XB and P2XE receptors indicates that there is limited functional redundancy among Dictyostelium P2X receptors.

  13. Activation and Regulation of Purinergic P2X Receptor Channels

    PubMed Central

    Coddou, Claudio; Yan, Zonghe; Obsil, Tomas; Huidobro-Toro, J. Pablo

    2011-01-01

    Mammalian ATP-gated nonselective cation channels (P2XRs) can be composed of seven possible subunits, denoted P2X1 to P2X7. Each subunit contains a large ectodomain, two transmembrane domains, and intracellular N and C termini. Functional P2XRs are organized as homomeric and heteromeric trimers. This review focuses on the binding sites involved in the activation (orthosteric) and regulation (allosteric) of P2XRs. The ectodomains contain three ATP binding sites, presumably located between neighboring subunits and formed by highly conserved residues. The detection and coordination of three ATP phosphate residues by positively charged amino acids are likely to play a dominant role in determining agonist potency, whereas an AsnPheArg motif may contribute to binding by coordinating the adenine ring. Nonconserved ectodomain histidines provide the binding sites for trace metals, divalent cations, and protons. The transmembrane domains account not only for the formation of the channel pore but also for the binding of ivermectin (a specific P2X4R allosteric regulator) and alcohols. The N- and C- domains provide the structures that determine the kinetics of receptor desensitization and/or pore dilation and are critical for the regulation of receptor functions by intracellular messengers, kinases, reactive oxygen species and mercury. The recent publication of the crystal structure of the zebrafish P2X4.1R in a closed state provides a major advance in the understanding of this family of receptor channels. We will discuss data obtained from numerous site-directed mutagenesis experiments accumulated during the last 15 years with reference to the crystal structure, allowing a structural interpretation of the molecular basis of orthosteric and allosteric ligand actions. PMID:21737531

  14. J-2X, The Engine of the Future

    NASA Technical Reports Server (NTRS)

    Smith, Gail

    2009-01-01

    My project was two-fold, with both parts involving the J-2X Upper Stage engine (which will be used on both the Ares I and V). Mainly, I am responsible for using a program called Iris to create visual represen tations of the rocket engine's telemetry data. Also, my project includes the application of my newly acquired Pro Engineer skills in develo ping a 3D model of the engine's nozzle.

  15. Engine Gimbal Requirements for Ground Testing of J-2X

    NASA Technical Reports Server (NTRS)

    Kovalcik, Julia; Leahy, Joe

    2009-01-01

    Based on the Apollo-era J-2 that powered the second and third stages of the Saturn V, the current J-2X is the liquid hydrogen and oxygen high-altitude rocket engine in development for both the Ares I Upper Stage and Ares V Earth Departure Stage. During my summer 2009 internship, J-2X was at a stage in its design maturity where verification testing needed to be considered for the benefit of adequate test facility preparation. My task was to focus on gimbal requirements and gimbal related hot-fire test plans. Facility capabilities were also of interest, specifically for hot-fire testing slated to occur at test stands A-1, A-2, and A-3 at Stennis Space Center(SSC) in Bay St. Louis, Mississippi. Gimbal requirements and stage interface conditions were investigated by applying a top-to-bottom systems engineering approach, which involved system level requirements, engine level requirements from both government and engine contractor perspectives, component level requirements, and the J-2X to Upper Stage and Earth Departure Stage interface control documents. Previous hydrogen and oxygen liquid rocket engine gimbal verification methods were researched for a glimpse at lessons learned. Discussion among the J-2X community affected by gimballing was organized to obtain input relative to proper verification of their respective component. Implementing suggestions such as gimbal pattern, angulated dwell time, altitude testing options, power level, and feed line orientation, I was able to match tests to test stands in the A Complex at SSC. Potential test capability gaps and risks were identified and pursued. The culmination of all these efforts was to coordinate with SSC to define additional facility requirements for both the A-3 altitude test stand that is currently under construction and the A-1 sea level test stand which is being renovated

  16. Scanning Tunneling Microscopy of SILICON(100) 2 X 1

    NASA Astrophysics Data System (ADS)

    Hubacek, Jerome S.

    1992-01-01

    The Si(100) 2 x 1 surface, a technologically important surface in microelectronics and silicon molecular beam epitaxy (MBE), has been studied with the scanning tunneling microscope (STM) to attempt to clear up the controversy that surrounds previous studies of this surface. To this end, an ultra-high vacuum (UHV) STM/surface science system has been designed and constructed to study semiconductor surfaces. Clean Si(100) 2 x 1 surfaces have been prepared and imaged with the STM. Atomic resolution images probing both the filled states and empty states indicate that the surface consists of statically buckled dimer rows. With electronic device dimensions shrinking to smaller and smaller sizes, the Si-SiO_2 interface is becoming increasingly important and, although it is the most popular interface used in the microelectronics industry, little is known about the initial stages of oxidation of the Si(100) surface. Scanning tunneling microscopy has been employed to examine Si(100) 2 x 1 surfaces exposed to molecular oxygen in UHV. Ordered rows of bright and dark spots, rotated 45^circ from the silicon dimer rows, appear in the STM images, suggesting that the Si(100)-SiO_2 interface may be explained with a beta -cristobalite(100) structure rotated by 45^ circ on the Si(100) surface.

  17. The J-2X Fuel Turbopump - Design, Development, and Test

    NASA Technical Reports Server (NTRS)

    Tellier, James G.; Hawkins, Lakiesha V.; Shinguchi, Brian H.; Marsh, Matthew W.

    2011-01-01

    Pratt and Whitney Rocketdyne (PWR), a NASA subcontractor, is executing the design, development, test, and evaluation (DDT&E) of a liquid oxygen, liquid hydrogen two hundred ninety four thousand pound thrust rocket engine initially intended for the Upper Stage (US) and Earth Departure Stage (EDS) of the Constellation Program Ares-I Crew Launch Vehicle (CLV). A key element of the design approach was to base the new J-2X engine on the heritage J-2S engine with the intent of uprating the engine and incorporating SSME and RS-68 lessons learned. The J-2S engine was a design upgrade of the flight proven J-2 configuration used to put American astronauts on the moon. The J-2S Fuel Turbopump (FTP) was the first Rocketdyne-designed liquid hydrogen centrifugal pump and provided many of the early lessons learned for the Space Shuttle Main Engine High Pressure Fuel Turbopumps. This paper will discuss the design trades and analyses performed for the current J-2X FTP to increase turbine life; increase structural margins, facilitate component fabrication; expedite turbopump assembly; and increase rotordynamic stability margins. Risk mitigation tests including inducer water tests, whirligig turbine blade tests, turbine air rig tests, and workhorse gas generator tests characterized operating environments, drove design modifications, or identified performance impact. Engineering design, fabrication, analysis, and assembly activities support FTP readiness for the first J-2X engine test scheduled for July 2011.

  18. P2X4R+ microglia drive neuropathic pain

    PubMed Central

    Beggs, Simon; Trang, Tuan; Salter, Michael W

    2016-01-01

    Neuropathic pain, the most debilitating of all clinical pain syndromes, may be a consequence of trauma, infection or pathology from diseases that affect peripheral nerves. Here we provide a framework for understanding the spinal mechanisms of neuropathic pain as distinct from those of acute pain or inflammatory pain. Recent work suggests that a specific microglia response phenotype characterized by de novo expression of the purinergic receptor P2X4 is critical for the pathogenesis of pain hypersensitivity caused by injury to peripheral nerves. Stimulating P2X4 receptors initiates a core pain signaling pathway mediated by release of brain-derived neurotrophic factor, which produces a disinhibitory increase in intracellular chloride in nociceptive (pain-transmitting) neurons in the spinal dorsal horn. The changes caused by signaling from P2X4R+ microglia to nociceptive transmission neurons may account for the main symptoms of neuropathic pain in humans, and they point to specific interventions to alleviate this debilitating condition. PMID:22837036

  19. J-2X Fuel Pump Impeller Seal Simulations

    NASA Technical Reports Server (NTRS)

    Schmauch, Preston B.; West, Jeffrey S.

    2011-01-01

    The J-2X engine was originally designed for the upper stage of the previously cancelled Crew Launch Vehicle. Although the Crew Launch Vehicle was cancelled the J-2X engine, which is currently undergoing hot-fire testing, may be used on future programs. The J-2X engine is a direct descendent of the J-2 engine which powered the upper stage during the Apollo program. Many changes including a thrust increase from 230K to 294K lbf have been implemented in this engine. The rotor-dynamic stability of the fuel turbopump is highly dependent on the tangential velocity of the fluid as it enters the the front face impeller seal. Rotor-dynamic analysis predicts that a much lower tangential velocity will be required for stability than was needed for previous engines. The geometry at the seal entrance for this engine is very complex and vastly different than previous engines. In order to better determine the fluid dynamics and tangential velocity in this seal several CFD simulations were performed. The results of these simulations show that for this seal geometry a great reduction in the tangential velocity is to be expected. The simulations also provided insight into methods that could be employed to drive the swirl velocity to near zero. Unsteady and time-averaged results of several simulations will be presented.

  20. A fluorescent approach for identifying P2X1 ligands

    PubMed Central

    Ruepp, Marc-David; Brozik, James A.; de Esch, Iwan J.P.; Farndale, Richard W.; Murrell-Lagnado, Ruth D.; Thompson, Andrew J.

    2015-01-01

    There are no commercially available, small, receptor-specific P2X1 ligands. There are several synthetic derivatives of the natural agonist ATP and some structurally-complex antagonists including compounds such as PPADS, NTP-ATP, suramin and its derivatives (e.g. NF279, NF449). NF449 is the most potent and selective ligand, but potencies of many others are not particularly high and they can also act at other P2X, P2Y and non-purinergic receptors. While there is clearly scope for further work on P2X1 receptor pharmacology, screening can be difficult owing to rapid receptor desensitisation. To reduce desensitisation substitutions can be made within the N-terminus of the P2X1 receptor, but these could also affect ligand properties. An alternative is the use of fluorescent voltage-sensitive dyes that respond to membrane potential changes resulting from channel opening. Here we utilised this approach in conjunction with fragment-based drug-discovery. Using a single concentration (300 μM) we identified 46 novel leads from a library of 1443 fragments (hit rate = 3.2%). These hits were independently validated by measuring concentration-dependence with the same voltage-sensitive dye, and by visualising the competition of hits with an Alexa-647-ATP fluorophore using confocal microscopy; confocal yielded kon (1.142 × 106 M−1 s−1) and koff (0.136 s−1) for Alexa-647-ATP (Kd = 119 nM). The identified hit fragments had promising structural diversity. In summary, the measurement of functional responses using voltage-sensitive dyes was flexible and cost-effective because labelled competitors were not needed, effects were independent of a specific binding site, and both agonist and antagonist actions were probed in a single assay. The method is widely applicable and could be applied to all P2X family members, as well as other voltage-gated and ligand-gated ion channels. This article is part of the Special Issue entitled ‘Fluorescent Tools in Neuropharmacology

  1. Peripheral inflammation upregulates P2X receptor expression in satellite glial cells of mouse trigeminal ganglia: a calcium imaging study.

    PubMed

    Kushnir, Raya; Cherkas, Pavel S; Hanani, Menachem

    2011-09-01

    Satellite glial cells (SGCs) in sensory ganglia are altered structurally and biochemically as a result of nerve injury. Whereas there is ample evidence that P2 purinergic receptors in central glial cells are altered after injury, there is very little information on similar changes in SGCs, although it is well established that SGCs are endowed with P2 receptors. Using calcium imaging, we characterized changes in P2 receptors in SGCs from mouse trigeminal ganglia in short-term cultures. Seven days after the induction of submandibular inflammation with complete Freund's adjuvant, there was a marked increase in the sensitivity of SGCs to ATP, with the threshold of activation decreasing from 5 μM to 10 nM. A similar observation was made in the intact trigeminal ganglion after infra-orbital nerve axotomy. Using pharmacological tools, we investigated the receptor mechanisms underlying these changes in cultured SGCs. We found that in control tissues response to ATP was mediated by P2Y (metabotropic) receptors, whereas after inflammation the response was mediated predominantly by P2X (ionotropic) receptors. As the contribution of P2X1,3,6 receptors was excluded, and the sensitivity to a P2X7 agonist did not change after inflammation, it appears that after inflammation the responses to ATP are largely due to P2X2 and/or 5 receptors, with a possible contribution of P2X4 receptors. We conclude that inflammation induced a large increase in the sensitivity of SGCs to ATP, which involved a switch from P2Y to P2X receptors. We propose that the over 100-fold augmented sensitivity of SGCs to ATP after injury may contribute to chronic pain states.

  2. Connecting node and method for constructing a connecting node

    NASA Technical Reports Server (NTRS)

    Johnson, Christopher J. (Inventor); Raboin, Jasen L. (Inventor); Spexarth, Gary R. (Inventor)

    2011-01-01

    A connecting node comprises a polyhedral structure comprising a plurality of panels joined together at its side edges to form a spherical approximation, wherein at least one of the plurality of panels comprises a faceted surface being constructed with a passage for integrating with one of a plurality of elements comprising a docking port, a hatch, and a window that is attached to the connecting node. A method for manufacturing a connecting node comprises the steps of providing a plurality of panels, connecting the plurality of panels to form a spherical approximation, wherein each edge of each panel of the plurality is joined to another edge of another panel, and constructing at least one of the plurality of panels to include a passage for integrating at least one of a plurality of elements that may be attached to the connecting node.

  3. Development of a 2x2 optical switch for plastic optical fiber using liquid crystal cells

    NASA Astrophysics Data System (ADS)

    Vazquez, Carmen; Sanchez-Pena, J. M.; Contreras, Pedro; Pontes, M. A. J.

    2005-07-01

    A 2x2 optical switch for plastic optical fibre (POF) has been developed, able to work for both 660 and 850nm simultaneous and independently of the input light's polarization, improving previous developments. The device has four bidirectional optical ports, and is able to switch from each port to any other. In this way, there are three operation modes: straight (each input connected to the corresponding output), crossed (inputs and outputs crosses) and closed (inputs connected on the one part, and output connected on the other part). As the device is bidirectional, inputs and outputs are interchangeable. The switching process is carried out by a set of Polarized Beam Splitters, Liquid Crystal cells, λ/4 plates, lens and mirrors. An electronic circuitry has been developed to control the state of the optical switch, which is shown in a Liquid Crystal Display. The system has been tested for both 660nm and 850nm, and the optical switch exhibits miliseconds switching times, an optical interchannel crosstalk better than -25 dB, and low power consumption. Applications of the switch include systems where a redundant path is needed to guarantee communication, such as safety systems in automobiles, LANs, telemedicine, heavy machinery in the industry along with coarse WDM GI (graded index) POF networks. Device size reduction is under development.

  4. Double P2X2/P2X3 Purinergic Receptor Knockout Mice Do Not Taste NaCl or the Artificial Sweetener SC45647

    PubMed Central

    Eddy, Meghan C.; Eschle, Benjamin K.; Barrows, Jennell; Hallock, Robert M.; Finger, Thomas E.

    2009-01-01

    The P2X ionotropic purinergic receptors, P2X2 and P2X3, are essential for transmission of taste information from taste buds to the gustatory nerves. Mice lacking both P2X2 and P2X3 purinergic receptors (P2X2/P2X3Dbl−/−) exhibit no taste-evoked activity in the chorda tympani and glossopharyngeal nerves when stimulated with taste stimuli from any of the 5 classical taste quality groups (salt, sweet, sour, bitter, and umami) nor do the mice show taste preferences for sweet or umami, or avoidance of bitter substances (Finger et al. 2005. ATP signaling is crucial for communication from taste buds to gustatory nerves. Science. 310[5753]:1495–1499). Here, we compare the ability of P2X2/P2X3Dbl−/− mice and P2X2/P2X3Dbl+/+ wild-type (WT) mice to detect NaCl in brief-access tests and conditioned aversion paradigms. Brief-access testing with NaCl revealed that whereas WT mice decrease licking at 300 mM and above, the P2X2/P2X3Dbl−/− mice do not show any change in lick rates. In conditioned aversion tests, P2X2/P2X3Dbl−/− mice did not develop a learned aversion to NaCl or the artificial sweetener SC45647, both of which are easily avoided by conditioned WT mice. The inability of P2X2/P2X3Dbl−/− mice to show avoidance of these taste stimuli was not due to an inability to learn the task because both WT and P2X2/P2X3Dbl−/− mice learned to avoid a combination of SC45647 and amyl acetate (an odor cue). These data suggest that P2X2/P2X3Dbl−/− mice are unable to respond to NaCl or SC45647 as taste stimuli, mirroring the lack of gustatory nerve responses to these substances. PMID:19833661

  5. Ge Quantum Dot Formation on Si (100)-2x1 with Surface Electronic Excitation

    NASA Astrophysics Data System (ADS)

    Oguzer, Ali

    2009-03-01

    The effect of laser-induced electronic excitations on the self-assembly of Ge quantum dots on Si (100)-2x1 grown by pulsed laser deposition is studied. The samples were first cleaned by using modified Shiraki method and then transferred into the deposition chamber. The vacuum system was then pumped down, baked for at least 12 hours, and the sample was then flashed to 1100 C in order for the 2x1 reconstruction to form. The experiment was conducted under a pressure ˜1x10-10 Torr. A Q-switched Nd:YAG laser (wavelength λ = 1064 nm, 10 Hz repetition rate) was used to ablate a Ge target. In-situ RHEED and STM and ex-situ AFM were used to study the morphology of the grown QD. The dependence of the QD morphology on substrate temperature and ablation and excitation laser energy density was studied. Electronic excitation is shown to affect the surface morphology. Laser irradiation of the Si substrate is shown to decrease the roughness of films grown at a substrate temperature of ˜450 ^oC. Electronic excitation also affected surface coverage ratio and cluster density and decreased the temperature required to form 3-dimensional quantum dots. Possible mechanisms involved will be discussed.

  6. Subcellular distribution and early signalling events of P2X7 receptors from mouse cerebellar granule neurons.

    PubMed

    Sánchez-Nogueiro, Jesús; Marín-García, Patricia; Bustillo, Diego; Olivos-Oré, Luis Alcides; Miras-Portugal, María Teresa; Artalejo, Antonio R

    2014-12-05

    The subcellular distribution and early signalling events of P2X7 receptors were studied in mouse cerebellar granule neurons. Whole-cell patch-clamp recordings evidenced inwardly directed non-desensitizing currents following adenosine 5'-triphosphate (ATP; 600 µM) or 2'-3'-o-(4-benzoylbenzoyl)-adenosine 5'-triphosphate (BzATP; 100 µM) administration to cells bathed in a medium with no-added divalent cations (Ca(2+) and Mg(2+)). Nucleotide-activated currents were inhibited by superfusion of 2.5 mM Ca(2+), 1.2 mM Mg(2+) or 100 nM Brilliant Blue G (BBG), hence indicating the expression of ionotropic P2X7 receptors. Fura-2 calcium imaging showed [Ca(2+)]i elevations in response to ATP or BzATP at the somas and at a small number of axodendritic regions of granule neurons. Differential sensitivity of these [Ca(2+)]i increases to three different P2X7 receptor antagonists (100 nM BBG, 10 μM 4-[(2S)-2-[(5-isoquinolinylsulfonyl)methylamino]-3-oxo-3-(4-phenyl-1-piperazinyl)propyl] phenyl isoquinolinesulfonic acid ester, KN-62, and 1 μM 3-(5-(2,3-dichlorophenyl)-1H-tetrazol-1-yl)methyl pyridine hydrochloride hydrate, A-438079) revealed that P2X7 receptors are co-expressed with different P2Y receptors along the plasmalemma of granule neurons. Finally, experiments with the fluorescent dye YO-PRO-1 indicated that prolonged stimulation of P2X7 receptors does not lead to the opening of a membrane pore permeable to large cations. Altogether, our results emphasise the expression of functional P2X7 receptors at both the axodendritic and somatic levels in mouse cerebellar granule neurons, and favour the notion that P2X7 receptors might function in a subcellular localisation-specific manner: presynaptically, by controlling glutamate release, and on the cell somas, by supporting granule neuron survival against glutamate excytotoxicity.

  7. Mechanochemical synthesis of high thermoelectric performance bulk Cu2X (X = S, Se) materials

    NASA Astrophysics Data System (ADS)

    Yang, Dongwang; Su, Xianli; Yan, Yonggao; He, Jian; Uher, Ctirad; Tang, Xinfeng

    2016-11-01

    We devised a single-step mechanochemical synthesis/densification procedure for Cu2X (X = S, Se) thermoelectric materials via applying a pressure of 3 GPa to a stoichiometric admixture of elemental Cu and X for 3 min at room temperature. The obtained bulk materials were single-phase, nearly stoichiometric structures with a relative packing density of 97% or higher. The structures contained high concentration of atomic scale defects and pores of 20-200 nm diameter. The above attributes gave rise to a high thermoelectric performance: at 873 K, the ZT value of Cu2S reached 1.07, about 2.1 times the value typical of samples grown from the melt. The ZT value of Cu2Se samples reached in excess of 1.2, close to the state-of-the-art value.

  8. The UC2-x - Carbon eutectic: A laser heating study

    NASA Astrophysics Data System (ADS)

    Manara, D.; Boboridis, K.; Morel, S.; De Bruycker, F.

    2015-11-01

    The UC2-x - carbon eutectic has been studied by laser heating and fast multi-wavelength pyrometry under inert atmosphere. The study has been carried out on three compositions, two of which close to the phase boundary of the UC2-x - C miscibility gap (with C/U atomic ratios 2 and 2.1), and one, more crucial, with a large excess of carbon (C/U = 2.82). The first two compositions were synthesised by arc-melting. This synthesis method could not be applied to the last composition, which was therefore completed directly by laser irradiation. The U - C - O composition of the samples was checked by using a combustion method in an ELTRA® analyser. The eutectic temperature, established to be 2737 K ± 20 K, was used as a radiance reference together with the cubic - tetragonal (α → β) solid state transition, fixed at 2050 K ± 20 K. The normal spectral emissivity of the carbon-richer compounds increases up to 0.7, whereas the value 0.53 was established for pure hypostoichiometric uranium dicarbide at the limit of the eutectic region. This increase is analysed in the light of the demixing of excess carbon, and used for the determination of the liquidus temperature (3220 K ± 50 K for UC2.82). Due to fast solid state diffusion, also fostered by the cubic - tetragonal transition, no obvious signs of a lamellar eutectic structure could be observed after quenching to room temperature. The eutectic surface C/UC2-x composition could be qualitatively, but consistently, followed during the cooling process with the help of the recorded radiance spectra. Whereas the external liquid surface is almost entirely constituted by uranium dicarbide, it gets rapidly enriched in demixed carbon upon freezing. Demixed carbon seems to quickly migrate towards the inner bulk during further cooling. At the α → β transition, uranium dicarbide covers again the almost entire external surface.

  9. Assessment of mercury chloride-induced toxicity and the relevance of P2X7 receptor activation in zebrafish larvae.

    PubMed

    Cruz, Fernanda Fernandes; Leite, Carlos Eduardo; Pereira, Talita Carneiro Brandão; Bogo, Maurício Reis; Bonan, Carla Denise; Battastini, Ana Maria Oliveira; Campos, Maria Martha; Morrone, Fernanda Bueno

    2013-09-01

    Zebrafish (Danio rerio) has been adopted as a model for behavioral, immunological and toxicological studies. Mercury is a toxic heavy metal released into the environment. There is evidence indicating that heavy metals can modulate ionotropic receptors, including the purinergic receptor P2X7. Therefore, this study evaluated the in vivo effects of acute exposure to mercury chloride (HgCl2) in zebrafish larvae and to investigate the involvement of P2X7R in mercury-related toxicity. Larvae survival was evaluated for 24 h after exposure to HgCl2, ATP or A740003. The combination of ATP (1 mM) and HgCl2 (20 μg/L) decreased survival when compared to ATP 1 mM. The antagonist A740003 (300 and 500 nM) increased the survival time, and reversed the mortality caused by ATP and HgCl2 in association. Quantitative real time PCR showed a decrease of P2X7R expression in the larvae treated with HgCl2 (20 μg/L). Evaluating the oxidative stress our results showed decreased CAT (catalase) activity and increased MDA (malondialdehyde) levels. Of note, the combination of ATP with HgCl2 showed an additive effect. This study provides novel evidence on the possible mechanisms underlying the toxicity induced by mercury, indicating that it is able to modulate P2X7R in zebrafish larvae.

  10. Binary 193nm photomasks aging phenomenon study

    NASA Astrophysics Data System (ADS)

    Dufaye, Félix; Sartelli, Luca; Pogliani, Carlo; Gough, Stuart; Sundermann, Frank; Miyashita, Hiroyuki; Hidenori, Yoshioka; Charras, Nathalie; Brochard, Christophe; Thivolle, Nicolas

    2011-05-01

    193nm binary photomasks are still used in the semiconductor industry for the lithography of some critical layers for the nodes 90nm and 65nm, with high volumes and over long period. These 193nm binary masks seem to be well-known but recent studies have shown surprising degrading effects, like Electric Field induced chromium Migration (EFM) [1] or chromium migration [2] [3] . Phase shift Masks (PSM) or Opaque MoSi On Glass (OMOG) might not be concerned by these effects [4] [6] under certain conditions. In this paper, we will focus our study on two layers gate and metal lines. We will detail the effects of mask aging, with SEM top view pictures revealing a degraded chromium edge profile and TEM chemical analyses demonstrating the growth of a chromium oxide on the sidewall. SEMCD measurements after volume production indicated a modified CD with respect to initial CD data after manufacture. A regression analysis of these CD measurements shows a radial effect, a die effect and an isolated-dense effect. Mask cleaning effectiveness has also been investigated, with sulphate or ozone cleans, to recover the mask quality in terms of CD. In complement, wafer intrafield CD measurements have been performed on the most sensitive structure to monitor the evolution of the aging effect on mask CD uniformity. Mask CD drift have been correlated with exposure dose drift and isolated-dense bias CD drift on wafers. In the end, we will try to propose a physical explanation of this aging phenomenon and a solution to prevent from it occurring.

  11. Generators for the elliptic curve y2 = x3-nx

    NASA Astrophysics Data System (ADS)

    Fujita, Yasutsugu; Terai, Nobuhiro

    2010-07-01

    Let E:y2 = x3-nx be an elliptic curve over the rationals with a positive integer n. Mordell's theorem asserts that the group of rational points on E is finitely generated. Our interest is in the generators for its free part. Duquesne (2007) showed that if n = (2k2-2k+1)(18k2+30k+17) is square-free, then certain two points of infinite order can always be in a system of generators. We generalize this result and show that the same is true for "infinitely many" infinite families n = n(k,l) with two variables.

  12. The 2X-Hi disks of spiral galaxies

    NASA Astrophysics Data System (ADS)

    Koribalski, Bärbel S.

    2017-03-01

    The outskirts of galaxies - especially the very extended Hi disks of galaxies - are strongly affected by their local environment. I highlight the giant 2X-Hi disks of nearby galaxies (M 83, NGC 3621, and NGC 1512), studied as part of the Local Volume Hi Survey (LVHIS), their kinematics and relation to XUV disks, signatures of tidal interactions and accretion events, the M HI - D HI relation as well as the formation of tidal dwarf galaxies. - Using multi-wavelength data, I create 3D visualisations of the gas and stars in galaxies, with the shape of their warped disks obtained through kinematic modelling of their Hi velocity fields.

  13. P2X receptors in cochlear Deiters' cells.

    PubMed

    Chen, C; Bobbin, R P

    1998-05-01

    1. The ionotropic purinoceptors in isolated Deiters' cells of guinea-pig cochlea were characterized by use of the whole-cell variant of the patch-clamp technique. 2. Extracellular application of adenosine 5'-triphosphate (ATP) induced a dose-dependent inward current when the cells were voltage-clamped at -80 mV. The ATP-induced current showed desensitization and had a reversal potential around -4 mV. 3. Increasing intracellular free Ca2+ by decreasing the concentration of EGTA in the pipette solution reduced the amplitude of the ATP-gated current. 4. The order of agonist potency was: 2-methylthioATP (2-meSATP)>ATP>benzoylbenzoyl-ATP (BzATP)>alpha,beta-methyleneATP (alpha,beta,meATP>adenosine 5'-diphosphate (ADP)>uridine 5'-triphosphate (UTP)>adenosine 5'-monophosphate (AMP)=adenosine (Ad). 5. Pretreatment with forskolin (10 microM), 8-bromoadenosine-3',5'-cyclophosphate (8-Br-cyclic AMP, 1 mM), 3-isobutyl-1-methylxanthine (IBMX, 1 mM) or phorbol-12-myristate-13-acetate (PMA, 1 microM) reversibly reduced the ATP-induced peak current. 6. The results are consistent with molecular biological data which indicate that P2X2 purinoceptors are present in Deiters' cells. In addition, the reduction of the ATP-gated current by activators of protein kinase A and protein kinase C indicates that these P2X2 purinoceptors can be functionally modulated by receptor phosphorylation.

  14. Powerpack Testing of the J2-X Oxidizer Turbopump

    NASA Technical Reports Server (NTRS)

    Jambusaria, Mitul; Szabo, Roland; Becht, David; Mulder, Andrew

    2013-01-01

    The J-2X PPA-2 (Powerpack 2) test series was conducted from February through December 2012 on the A1 test stand at NASA Stennis Space Center in a joint effort between Pratt and Whitney Rocketdyne (PWR) and NASA Marshall Space Flight Center (MSFC). The series consisted of 13 tests for a total hotfire duration close to 6500 seconds. Among the chief test objectives was characterization of the capabilities of the new J-2X turbopumps. This paper concentrates on the test results pertaining specifically to the Oxidizer Turbopump (OTP) operation in liquid oxygen (LOX). The two bladed inducer configuration that was tested had a 0.81% blade height tip clearance and incorporated the B-groove modification to the inducer tunnel outboard of the inducer leading edge. Data was collected on inducer suction performance, pump radial loading, and the pump dynamic environment in LOX. Comparisons were made to prior data collected on two geometrically similar subscale inducers tested in water at NASA MSFC (70% scale) and Concepts NREC (52% scale). In overview, the results of the powerpack testing were consistent with the radial load assessment from the water tests. The inducer performed differently in the other two categories, however. The inducer suction performance capability in LOX was notably improved. This was expected and is probably attributable to thermal suppression head (TSH) effects. While the dynamic environment was similar in most aspects to water test observations, the higher order cavitation (HOC) during the powerpack testing was much more benign.

  15. The J-2X Oxidizer Turbopump - Design, Development, and Test

    NASA Technical Reports Server (NTRS)

    Brozowski, Laura A.; Beatty, D. Preston; Shinguchi, Brian H.; Marsh, Matthew W.

    2011-01-01

    Pratt and Whitney Rocketdyne (PWR), a NASA subcontractor, is executing the Design, Development, Test, and Evaluation (DDT&E) of a liquid oxygen, liquid hydrogen two hundred ninety-four thousand pound thrust rocket engine initially intended for the Upper Stage (US) and Earth Departure Stage (EDS) of the Constellation Program Ares-I Crew Launch Vehicle (CLV). A key element of the design approach was to base the new J-2X engine on the heritage J-2S engine which was a design upgrade of the flight proven J-2 engine used to put American astronauts on the moon. This paper will discuss the design trades and analyses performed to achieve the required uprated Oxidizer Turbopump performance; structural margins and rotordynamic margins; incorporate updated materials and fabrication capability; and reflect lessons learned from legacy and existing Liquid Rocket Propulsion Engine turbomachinery. These engineering design, analysis, fabrication and assembly activities support the Oxidizer Turbopump readiness for J-2X engine test in 2011.

  16. 10 Years of Car-2-X Communication - a Success Story?

    NASA Astrophysics Data System (ADS)

    Wischhof, Lars; Ebner, André

    2012-05-01

    For more than ten years, car-2-x communication has been a major topic of research in the scientific community and an important development focus for the automotive industry. First, this article takes a retrospective look at the evolution of car-2-x and the two different communication paradigms: decentralized car-2-car communication and centralized cellular solutions. Afterwards, a comparison of their technical advantages and limitations is presented, respectively. The result shows that in order to implement safety-relevant applications, car-2-car communication has strong advantages compared to cellular technologies but requires high market penetration. However, its introduction solely for safety applications is difficult since the required penetration will not be achieved until several years after initial deployment. Therefore, car-2-car communication must provide a benefit to the customer, even in the phase of market introduction. For this purpose, the article outlines an approach called SODAD (Segment-Oriented Data Abstraction and Dissemination). It offers a possibility to introduce decentralized vehicular applications with early customer benefit, in order to enable safety applications based on car-2-car communication on a long term.

  17. Residual Chemosensory Capabilities in Double P2X2/P2X3 Purinergic Receptor Null Mice: Intraoral or Postingestive Detection?

    PubMed Central

    Hallock, Robert M.; Tatangelo, Marco; Barrows, Jennell

    2009-01-01

    Mice lacking the purinergic receptors, P2X2 and P2X3 (P2X2/P2X3Dbl−/−), exhibit essentially no tastant-evoked activity in the chorda tympani and glossopharyngeal nerves and substantial loss of tastant-evoked behavior as measured in long-term intake experiments. To assess whether the residual chemically driven behaviors in these P2X2/P2X3Dbl−/− mice were attributable to postingestive detection or oropharyngeal detection of the compounds, we used brief access lickometer tests to assess the behavioral capabilities of the P2X2/P2X3Dbl−/− animals. The P2X2/P2X3Dbl−/− mice showed avoidance to high levels (10 mM quinine and 10–30 mM denatonium benzoate) of classical “bitter”-tasting stimuli in 24-h, 2-bottle preference tests but minimal avoidance of these substances in the lickometer tests, suggesting that the strong avoidance in the intake tests was largely mediated by post-oral chemosensors. Similarly, increases in consumption of 1 M sucrose by P2X2/P2X3Dbl−/− mice in long-term intake tests were not mirrored by increases in consumption of sucrose in lickometer tests, suggesting that sucrose detection in these mice is mediated by postingestive consequences. In contrast, in brief access tests, P2X2/P2X3Dbl−/− mice avoided citric acid and hydrochloric acid at the same concentrations as their wild-type counterparts, indicating that these weak acids activate oropharyngeal chemoreceptors. PMID:19833662

  18. Predicting Node Degree Centrality with the Node Prominence Profile

    PubMed Central

    Yang, Yang; Dong, Yuxiao; Chawla, Nitesh V.

    2014-01-01

    Centrality of a node measures its relative importance within a network. There are a number of applications of centrality, including inferring the influence or success of an individual in a social network, and the resulting social network dynamics. While we can compute the centrality of any node in a given network snapshot, a number of applications are also interested in knowing the potential importance of an individual in the future. However, current centrality is not necessarily an effective predictor of future centrality. While there are different measures of centrality, we focus on degree centrality in this paper. We develop a method that reconciles preferential attachment and triadic closure to capture a node's prominence profile. We show that the proposed node prominence profile method is an effective predictor of degree centrality. Notably, our analysis reveals that individuals in the early stage of evolution display a distinctive and robust signature in degree centrality trend, adequately predicted by their prominence profile. We evaluate our work across four real-world social networks. Our findings have important implications for the applications that require prediction of a node's future degree centrality, as well as the study of social network dynamics. PMID:25429797

  19. LCP nanoparticle for tumor and lymph node metastasis imaging

    NASA Astrophysics Data System (ADS)

    Tseng, Yu-Cheng

    A lipid/calcium/phosphate (LCP) nanoparticle formulation (particle diameter ˜25 nm) has previously been developed to delivery siRNA with superior efficiency. In this work, 111In was formulated into LCP nanoparticles to form 111In-LCP for SPECT/CT imaging. With necessary modifications and improvements of the LCP core-washing and surface-coating methods, 111In-LCP grafted with polyethylene glycol exhibited reduced uptake by the mononuclear phagocytic system. SPECT/CT imaging supported performed biodistribution studies, showing clear tumor images with accumulation of 8% or higher injected dose per gram tissue (ID/g) in subcutaneous, human-H460, lung-cancer xenograft and mouse-4T1, breast cancer metastasis models. Both the liver and the spleen accumulated ˜20% ID/g. Accumulation in the tumor was limited by the enhanced permeation and retention effect and was independent of the presence of a targeting ligand. A surprisingly high accumulation in the lymph nodes (˜70% ID/g) was observed. In the 4T1 lymph node metastasis model, the capability of intravenously injected 111In-LCP to visualize the size-enlarged and tumor-loaded sentinel lymph node was demonstrated. By analyzing the SPECT/CT images taken at different time points, the PK profiles of 111In-LCP in the blood and major organs were determined. The results indicated that the decrement of 111In-LCP blood concentration was not due to excretion, but to tissue penetration, leading to lymphatic accumulation. Larger LCP (diameter ˜65 nm) nanoparticles were also prepared for the purpose of comparison. Results indicated that larger LCP achieved slightly lower accumulation in the tumor and lymph nodes, but much higher accumulation in the liver and spleen; thus, larger nanoparticles might not be favorable for imaging purposes. We also demonstrated that LCP with a diameter of ˜25 nm were better able to penetrate into tissues, travel in the lymphatic system and preferentially accumulate in the lymph nodes due to 1) small

  20. Anatomy and histology of Virchow's node.

    PubMed

    Mizutani, Masaomi; Nawata, Shin-ichi; Hirai, Ichiro; Murakami, Gen; Kimura, Wataru

    2005-12-01

    A regional lymphatic system is composed of the first, second, third and even fourth or much more intercalated nodes along the lymptatic route from the periphery to the venous angle or the thoracic duct. The third or fourth node is usually termed the last-intercalated node or end node along the route. Similarly, one of the supraclavicular nodes is known to correspond to the end node along the thoracic duct. It is generally called 'Virchow's node', in which the famous 'Virchow's metastasis' of advanced gastric cancer occurs. The histology of this node has not been investigated, although region-specific differences in histology are evident in human lymph nodes. We found macroscopically the end node in five of 30 donated cadavers. Serial sections were prepared for these five nodes and sections stained with hematoxylin and eosin. Histological investigation revealed that, on the inferior or distal side of the end node, the thoracic duct divided into three to 10 collateral ducts and these ducts surrounded the node. The node communicated with the thoracic duct and its collaterals at multiple sites in two to three hilus-like portions, as well as along the subcapsular sinus. Thus, the end node was aligned parallel to the thoracic duct. Moreover, the superficial and deep cortex areas of the end node were fragmented to make an island-like arrangement, which may cause the short-cut intranodal shunt. Consequenly, the filtration function of most of Virchow's node seemed to be quite limited.

  1. P2X Receptors Inhibit NaCl Absorption in mTAL Independently of Nitric Oxide

    PubMed Central

    Svendsen, Samuel L.; Isidor, Søren; Praetorius, Helle A.; Leipziger, Jens

    2017-01-01

    Activation of basolateral P2X receptors markedly reduces NaCl absorption in mouse medullary thick ascending limb (mTAL). Here we tested the role of nitric oxide (NO) in the ATP-mediated (P2X) transport inhibition. We used isolated, perfused mTALs from mice to electrically measure NaCl absorption. By microelectrodes we determined the transepithelial voltage (Vte) and transepithelial resistance (Rte). Via these two parameters, we calculated the equivalent short circuit current, I'sc as a measure of the transepithelial Na+ absorption. Basolateral ATP (100 μM) acutely induced reversible inhibition of Na+ absorption (24 ± 4%, n = 10). Addition of L-arginine (100 μM) had no apparent effect on the ATP-induced transport inhibition. Acute reduction of extracellular [Ca2+] to either 100 nM or 0 nM by addition of EGTA had no effect on the ATP-induced transport inhibition. In the presence of the NO synthase (NOS) inhibitor L-NAME (100 μM) and/or ODQ to inhibit the guanylyl cyclase, the ATP effect remained unaffected. Increasing the concentration and incubation time for L-NAME (1 mM) still did not reveal any effect on the ATP-mediated transport inhibition. Acute addition of the NO donors SNAP (100 μM) and Spermine NONOate (10 μM) did not alter tubular transport. High concentrations of L-NAME (1 mM) in itself, however, reduced the transepithelial transport significantly. Thus, we find no evidence for nitric oxide (NO) as second messenger for P2X receptor-dependent transport inhibition in mTAL. Moreover, Ca2+ signaling appears not involved in the ATP-mediated effect. It remains undefined how P2X receptors trigger the marked reduction of transport in the TAL. PMID:28174542

  2. Comparison of three magnetic nanoparticle tracers for sentinel lymph node biopsy in an in vivo porcine model

    PubMed Central

    Pouw, Joost J; Ahmed, Muneer; Anninga, Bauke; Schuurman, Kimberley; Pinder, Sarah E; Van Hemelrijck, Mieke; Pankhurst, Quentin A; Douek, Michael; ten Haken, Bennie

    2015-01-01

    Introduction Breast cancer staging with sentinel lymph node biopsy relies on the use of radioisotopes, which limits the availability of the procedure worldwide. The use of a magnetic nanoparticle tracer and a handheld magnetometer provides a radiation-free alternative, which was recently evaluated in two clinical trials. The hydrodynamic particle size of the used magnetic tracer differs substantially from the radioisotope tracer and could therefore benefit from optimization. The aim of this study was to assess the performance of three different-sized magnetic nanoparticle tracers for sentinel lymph node biopsy within an in vivo porcine model. Materials and methods Sentinel lymph node biopsy was performed within a validated porcine model using three magnetic nanoparticle tracers, approved for use in humans (ferumoxytol, with hydrodynamic diameter dH =32 nm; Sienna+®, dH =59 nm; and ferumoxide, dH =111 nm), and a handheld magnetometer. Magnetometer counts (transcutaneous and ex vivo), iron quantification (vibrating sample magnetometry), and histopathological assessments were performed on all ex vivo nodes. Results Transcutaneous “hotspots” were present in 12/12 cases within 30 minutes of injection for the 59 nm tracer, compared to 7/12 for the 32 nm tracer and 8/12 for the 111 nm tracer, at the same time point. Ex vivo magnetometer counts were significantly greater for the 59 nm tracer than for the other tracers. Significantly more nodes per basin were excised for the 32 nm tracer compared to other tracers, indicating poor retention of the 32 nm tracer. Using the 59 nm tracer resulted in a significantly higher iron accumulation compared to the 32 nm tracer. Conclusion The 59 nm tracer demonstrated rapid lymphatic uptake, retention in the first nodes reached, and accumulation in high concentration, making it the most suitable tracer for intraoperative sentinel lymph node localization. PMID:25709445

  3. Ordering processes in monophase CeH2+x

    NASA Astrophysics Data System (ADS)

    Ratishvili, I. G.; Vajda, P.; Boukraa, A.; Namoradze, N. Z.

    1994-06-01

    The hydrogen ordering processes in the β phase of the rare-earth hydride system CeH2+x are analyzed. It is assumed that, within the discussed concentration range (x<0.75), the stable states of the metal-hydrogen system are homogeneous monophase solutions with fixed concentrations. The description of ordering is based upon the mean-field approximation of the static-concentration-waves theory. The relevant energy constants describing the H-H interactions are determined using available experimental data corresponding to the order-disorder transformation temperatures. It is shown that in the system under consideration there exists (in the concentration range x>=0.35), besides the usual order-disorder transformation, an additional order-order transition at low temperatures which, in some cases (for x>0.44), has a two-step character.

  4. Magnetic structure of NiS2 -xSex

    NASA Astrophysics Data System (ADS)

    Yano, S.; Louca, Despina; Yang, J.; Chatterjee, U.; Bugaris, D. E.; Chung, D. Y.; Peng, L.; Grayson, M.; Kanatzidis, Mercouri G.

    2016-01-01

    NiS2 -2 xSex is revisited to determine the magnetic structure using neutron diffraction and magnetic representational analysis. Upon cooling, the insulating parent compound, NiS2, becomes antiferromagnetic with two successive magnetic transitions. The first transition (M 1 ) occurs at TN˜39 K with Γ1ψ1 symmetry and a magnetic propagation vector of k =(000 ) . The second transition (M 2 ) occurs at TN˜30 K with k =(0.5 ,0.5 ,0.5 ) and a Γ1ψ2 symmetry with face-centered translations, giving rise to four possible magnetic domains. With doping, the system becomes metallic. The transition to the M 2 state is suppressed prior to x =0.4 while the M 1 state persists. The M 1 magnetic structure gradually vanishes by x ˜0.8 at a lower concentration than previously reported. The details of the magnetic structures are provided.

  5. Thermodynamics of fission products in UO2+-x

    SciTech Connect

    Nerikar, Pankaj V

    2009-01-01

    The stabilities of selected fission products - Xe, Cs, and Sr - are investigated as a function of non-stoichiometry x in UO{sub 2{+-}x}. In particular, density functional theory (OFT) is used to calculate the incorporation and solution energies of these fission products at the anion and cation vacancy sites, at the divacancy, and at the bound Schottky defect. In order to reproduce the correct insulating state of UO{sub 2}, the DFT calculations are performed using spin polarization and with the Hubbard U tenn. In general, higher charge defects are more soluble in the fuel matrix and the solubility of fission products increases as the hyperstoichiometry increases. The solubility of fission product oxides is also explored. CS{sub 2}O is observed as a second stable phase and SrO is found to be soluble in the UO{sub 2} matrix for all stoichiometries. These observations mirror experimentally observed phenomena.

  6. First-principles calculations of PuO(2+/-x).

    PubMed

    Petit, L; Svane, A; Szotek, Z; Temmerman, W M

    2003-07-25

    The electronic structure of PuO(2+/-x) was studied using first-principles quantum mechanics, realized with the self-interaction corrected local spin density method. In the stoichiometric PuO2 compound, Pu occurs in the Pu(IV) oxidation state, corresponding to a localized f4 shell. If oxygen is introduced onto the octahedral interstitial site, the nearby Pu atoms turn into Pu(V) (f3) by transferring electrons to the oxygen. Oxygen vacancies cause Pu(III) (f5) to form by taking up electrons released by oxygen. At T = 0, the PuO2 compound is stable with respect to free oxygen, but the delicate energy balance suggests the possible deterioration of the material during long-term storage.

  7. SU(2) x U(1) vacuum and the Centauro events

    NASA Technical Reports Server (NTRS)

    Kazanas, D.; Balasubrahmanyan, V. K.; Streitmatter, R. E.

    1985-01-01

    It is proposed that the fireballs invoked to explain the Centauro events are bubbles of a metastable superdense state of nuclear matter, created in high energy (E approximately 10 to the 15th power eV) cosmic ray collisions at the top of the atmosphere. If these bubbles are created with a Lorentz factor gamma approximately equals 10 at their CM frame, the objections against the origin of these events in cosmic ray interactions are overcome. A relationship then between their lifetime, tau, and the threshold energy for bubble formation, E sub th, appears to be insensitive to the value of tau and always close to E sub th approximately 10 to 15th power eV. Finally it is speculated that these bubbles might be manifestations of the SU(2) x U(1) false vacuum excited in these collisions. The absence of in the Centauro events is then explained by the decay modes of these excitations.

  8. P2X receptors in cochlear Deiters' cells

    PubMed Central

    Chen, Chu; Bobbin, Richard P

    1998-01-01

    The ionotropic purinoceptors in isolated Deiters' cells of guinea-pig cochlea were characterized by use of the whole-cell variant of the patch-clamp technique.Extracellular application of adenosine 5′-triphosphate (ATP) induced a dose-dependent inward current when the cells were voltage-clamped at −80 mV. The ATP-induced current showed desensitization and had a reversal potential around −4 mV.Increasing intracellular free Ca2+ by decreasing the concentration of EGTA in the pipette solution reduced the amplitude of the ATP-gated current.The order of agonist potency was: 2-methylthioATP (2-meSATP)>ATP>benzoylbenzoyl-ATP (BzATP)>α,β-methyleneATP (α,β,meATP>adenosine 5′-diphosphate (ADP)>uridine 5′-triphosphate (UTP)>adenosine 5′-monophosphate (AMP)=adenosine (Ad).Pretreatment with forskolin (10 μM), 8-bromoadenosine-3′,5′-cyclophosphate (8-Br-cyclic AMP, 1 mM), 3-isobutyl-1-methylxanthine (IBMX, 1 mM) or phorbol-12-myristate-13-acetate (PMA, 1 μM) reversibly reduced the ATP-induced peak current.The results are consistent with molecular biological data which indicate that P2X2 purinoceptors are present in Deiters' cells. In addition, the reduction of the ATP-gated current by activators of protein kinase A and protein kinase C indicates that these P2X2 purinoceptors can be functionally modulated by receptor phosphorylation. PMID:9641551

  9. Subscale Injector Testing to Support J-2X Engine Development

    NASA Technical Reports Server (NTRS)

    Protz, Christopher; Elam, Sandy; Weber, Jim; Miller, Ken

    2008-01-01

    The J-2X engine being pursued for the Ares I will be a derivative of the J-2 engine developed by Pratt & Whitney Rocketdyne (PWR). As part of the engine development, a subscale injector was fabricated by PWR and hot-fire tested at NASA s Marshall Space Flight Center (MSFC) to evaluate performance data. This subscale injector had a reduced injector diameter and fewer elements than the full scale design, but the element density (#elements / injector area), and element geometries nearly identical to the full scale design. Three different materials were used for the LOX posts in order to test for durability. The subscale injector included 46 standard elements and 6 baffle elements, corresponding to the ratio of baffled elements to core elements in the full scale design. The baffle elements were included to demonstrate thermal compatibility of the baffles and to more closely represent the full scale performance. Fifteen hot-fire tests were conducted totaling over 200 seconds of mainstage time on the injector. Chamber pressures with oxygen/hydrogen propellants ranged from 870-1380 psig with mixture ratios ranging from 4.8-6.1. Fuel manifold inlet temperatures were varied from 190 to 300 R. Modular, water cooled, calorimeter chamber assemblies were used to provide heating rate data and evaluate the effects of characteristic length (L*). Performance was evaluated relative to the resulting characteristic velocity (C*) efficiency. Performance met the value required in order to proceed with this design for the full scale hardware. Hardware inspections show no evidence of cracking at the tip of the LOX post for any of the materials tested. Minor erosion of the baffle element tips was observed in the early testing. A design change was quickly implemented and tested, and this change resolved the issue. Development of the J-2X is continuing with this element density and design.

  10. Combustion Stability Analyses for J-2X Gas Generator Development

    NASA Technical Reports Server (NTRS)

    Hulka, J. R.; Protz, C. S.; Casiano, M. J.; Kenny, R. J.

    2010-01-01

    The National Aeronautics and Space Administration (NASA) is developing a liquid oxygen/liquid hydrogen rocket engine for upper stage and trans-lunar applications of the Ares vehicles for the Constellation program. This engine, designated the J-2X, is a higher pressure, higher thrust variant of the Apollo-era J-2 engine. Development was contracted to Pratt & Whitney Rocketdyne in 2006. Over the past several years, development of the gas generator for the J-2X engine has progressed through a variety of workhorse injector, chamber, and feed system configurations. Several of these configurations have resulted in injection-coupled combustion instability of the gas generator assembly at the first longitudinal mode of the combustion chamber. In this paper, the longitudinal mode combustion instabilities observed on the workhorse test stand are discussed in detail. Aspects of this combustion instability have been modeled at the NASA Marshall Space Flight Center with several codes, including the Rocket Combustor Interaction Design and Analysis (ROCCID) code and a new lumped-parameter MatLab model. To accurately predict the instability characteristics of all the chamber and injector geometries and test conditions, several features of the submodels in the ROCCID suite of calculations required modification. Finite-element analyses were conducted of several complicated combustion chamber geometries to determine how to model and anchor the chamber response in ROCCID. A large suite of sensitivity calculations were conducted to determine how to model and anchor the injector response in ROCCID. These modifications and their ramification for future stability analyses of this type are discussed in detail. The lumped-parameter MatLab model of the gas generator assembly was created as an alternative calculation to the ROCCID methodology. This paper also describes this model and the stability calculations.

  11. Structural and luminescence properties of Y(2-x)GeMoO8:REx (RE = Eu, Tb) phosphors.

    PubMed

    Li, Naixu; Zhou, Jiancheng; Sun, Yueming

    2014-08-01

    Y(2-x)GeMoO8:REx (RE = Eu, Tb) phosphors were synthesized using a facile sol-gel method. The morphology and structure of the phosphors were characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM) and X-ray diffraction (XRD); while their luminescent properties were investigated by photoluminescence (PL) spectrometry. Our results reveal that all of these Y(2-x)GeMoO8:REx (RE = Eu, Tb) phosphors adopted the tetragonal phase, belonging to Scheelite (CaWO4 ) structure. The obtained YGeMoO8:Eu phosphors exhibit a strong emission in the red light range which can be assigned to the (5)D0  → (7)F2 transition of Eu(3+) when it is excited at 459 nm. Under 392 and 489 nm excitation, the YGeMoO8:Tb phosphors present predominant green emission ((5)D4  → (7)F5) at 540 nm. The highest emission of the phosphors can be achieved by adjusting the doping concentration to be 0.25 for Eu(3+) and 0.15 for Tb(3+), respectively. The promising luminescence properties of these materials indicate that they can be potentially applied to white-light-emitting diodes.

  12. Structure, luminescence and thermal quenching properties of Eu doped Sr2-xBaxSi5N8 red phosphors

    NASA Astrophysics Data System (ADS)

    Liu, Y. H.; Chen, L.; Zhou, X. F.; Liu, R. H.; Zhuang, W. D.

    2017-02-01

    Eu2+ doped Sr2-xBaxSi5N8 phosphors were synthesized at 1610 ℃ for 4 h via the solid-state reaction method. The XRD results confirm that the complete solid solutions are formed. With the increase of x, the emission spectra show an obvious blue-shift from 610 nm to 585 nm under the excitation of 460 nm. The color tone can be tuned from yellow to red. The corresponding mechanism for the blue-shift of peak-wavelength is studied in detail. The results of decomposed Gaussian spectra and fluorescence lifetime show that the local coordination structure surrounding activator ions changes with increasing x value. It is found that the probability of Eu occupying Sr1 and Sr2 site is dependent on Ba/Sr ratio. The variation of thermal quenching properties and the corresponding mechanism is discussed in detail. The results indicate that Eu2+ doped Sr2-xBaxSi5N8 is a promising orange red-emitting phosphor for near UV or blue light-pumped white light-emitting-diodes (wLEDs).

  13. Atomic layer deposited (ALD) TiO(2) and TiO(2-x)-N(x) thin film photocatalysts in salicylic acid decomposition.

    PubMed

    Vilhunen, S H; Sillanpää, M E T

    2009-01-01

    Degradation of salicylic acid (SA) with thin film photocatalyst, titanium dioxide (TiO(2)) and nitrogen-doped TiO(2) (TiO(2-x)-N(x)) combined with ultraviolet (UV) radiation was studied. TiO(2) film with thickness of 15 and 65 nm was tested. The TiO(2-x)-N(x) film had thickness of 15 nm on top of TiO(2) (50 nm). Photocatalysts were prepared on glass substrate by atomic layer deposition (ALD) technique. The effect of initial pH (3-10) was studied with SA concentration of 10 mg/l. Decomposition of SA was fastest at pH 6 with both films and the rate was equal at initial pH values 3 and 4.3. However, at higher pH values the non-doped film was more efficient.

  14. Characterization of (11)C-GSK1482160 for Targeting the P2X7 Receptor as a Biomarker for Neuroinflammation.

    PubMed

    Territo, Paul R; Meyer, Jill A; Peters, Jonathan S; Riley, Amanda A; McCarthy, Brian P; Gao, Mingzhang; Wang, Min; Green, Mark A; Zheng, Qi-Huang; Hutchins, Gary D

    2017-03-01

    The purinergic receptor subtype 7 (P2X7R) represents a novel molecular target for imaging neuroinflammation via PET. GSK1482160, a potent P2X7R antagonist, has high receptor affinity, high blood-brain barrier penetration, and the ability to be radiolabeled with (11)C. We report the initial physical and biologic characterization of this novel ligand. Methods:(11)C-GSK1482160 was synthesized according to published methods. Cell density studies were performed on human embryonic kidney cell lines expressing human P2X7R (HEK293-hP2X7R) and underwent Western blotting, an immunofluorescence assay, and radioimmunohistochemistry analysis using P2X7R polyclonal antibodies. Receptor density and binding potential were determined by saturation and association-disassociation kinetics, respectively. Peak immune response to lipopolysaccharide treatment in mice was determined in time course studies and analyzed via Iba1 and P2X7R Western blotting and Iba1 immunohistochemistry. Whole-animal biodistribution studies were performed on saline- or lipopolysaccharide-treated mice at 15, 30, and 60 min after radiotracer administration. Dynamic in vivo PET/CT was performed on the mice at 72 h after administration of saline, lipopolysaccharide, or lipopolysaccharide + blocking, and 2-compartment, 5-parameter tracer kinetic modeling of brain regions was performed. Results: P2X7R changed linearly with concentrations or cell numbers. For high-specific-activity (11)C-GSK1482160, receptor density and Kd were 1.15 ± 0.12 nM and 3.03 ± 0.10 pmol/mg, respectively, in HEK293-hP2X7R membranes. Association constant kon, dissociation constant koff, and binding potential (kon/koff) in HEK293-hP2X7R cells were 0.2312 ± 0.01542 min(-1)⋅nM(-1), 0.2547 ± 0.0155 min(-1), and 1.0277 ± 0.207, respectively. Whole-brain Iba1 expression in lipopolysaccharide-treated mice peaked by 72 h on immunohistochemistry, and Western blot analysis of P2X7R for saline- and lipopolysaccharide-treated brain sections

  15. Measurement of the rate coefficient for collisional removal of O2(X3Sigma- g, upsilon=1) by O(3P).

    PubMed

    Kalogerakis, Konstantinos S; Copeland, Richard A; Slanger, Tom G

    2005-11-15

    We report a laboratory measurement of the rate coefficient for the collisional removal of O(2)(X(3)Sigma(g) (-),upsilon=1) by O((3)P) atoms. In the experiments, 266-nm laser light photodissociates ozone in a mixture of molecular oxygen and ozone. The photolysis step produces vibrationally excited O(2)(a(1)Delta(g)) that is rapidly converted to O(2)(X(3)Sigma(g) (-),upsilon=1-3) in a near-resonant electronic energy-transfer process with ground-state O(2). In parallel, a large amount of O((1)D) atoms is generated that promptly relaxes to O((3)P). Under the conditions of the experiments, only collisions with the photolytically produced O((3)P) atoms control the lifetime of O(2)(X(3)Sigma(g) (-),upsilon=1), because its removal by molecular oxygen at room temperature is extremely slow. Tunable 193-nm laser light monitors the temporal evolution of the O(2)(X(3)Sigma(g) (-),upsilon=1) population by detection of laser-induced fluorescence near 360 nm. The removal rate coefficient for O(2)(X(3)Sigma(g) (-),upsilon=1) by O((3)P) atoms is (3.2+/-1.0)x10(-12) cm(3) s(-1) (2sigma) at a temperature of 315+/-15 K (2sigma). This result is essential for the analysis and correct interpretation of the 6.3-mum H(2)O(nu(2)) band emission in the Earth's mesosphere and indicates that the deactivation of O(2)(X (3)Sigma(g) (-),upsilon=1) by O((3)P) atoms is significantly faster than the nominal values recently used in atmospheric models.

  16. Faster qualification of 193-nm resists for 100-nm development using photo cell monitoring

    NASA Astrophysics Data System (ADS)

    Jones, Chris M.; Kallingal, Chidam; Zawadzki, Mary T.; Jeewakhan, Nazneen N.; Kaviani, Nazila N.; Krishnan, Prakash; Klaum, Arthur D.; Van Ess, Joel

    2003-05-01

    The development of 100-nm design rule technologies is currently taking place in many R&D facilities across the world. For some critical alyers, the transition to 193-nm resist technology has been required to meet this leading edge design rule. As with previous technology node transitions, the materials and processes available are undergoing changes and improvements as vendors encounter and solve problems. The initial implementation of the 193-nm resits process did not meet the photolithography requirements of some IC manufacturers due to very high Post Exposure Bake temperature sensitivity and consequently high wafer to wafer CD variation. The photoresist vendors have been working to improve the performance of the 193-nm resists to meet their customer's requirements. Characterization of these new resists needs to be carried out prior to implementation in the R&D line. Initial results on the second-generation resists evaluated at Cypress Semicondcutor showed better CD control compared to the aelrier resist with comparable Depth of Focus (DOF), Exposure Latitute, Etch Resistance, etc. In addition to the standard lithography parameters, resist characterization needs to include defect density studies. It was found that the new resists process with the best CD control, resulted in the introduction of orders of magnitude higher yield limiting defects at Gate, Contact adn Local Interconnect. The defect data were shared with the resists vendor and within days of the discovery the resist vendor was able to pinpoint the source of the problem. The fix was confirmed and the new resists were successfully released to production. By including defect monitoring into the resist qualification process, Cypress Semiconductor was able to 1) drive correction actions earlier resulting in faster ramp and 2) eliminate potential yield loss. We will discuss in this paper how to apply the Micro Photo Cell Monitoring methodology for defect monitoring in the photolithogprhay module and the

  17. Scalable processes for fabricating non-volatile memory devices using self-assembled 2D arrays of gold nanoparticles as charge storage nodes.

    PubMed

    Muralidharan, Girish; Bhat, Navakanta; Santhanam, Venugopal

    2011-11-01

    We propose robust and scalable processes for the fabrication of floating gate devices using ordered arrays of 7 nm size gold nanoparticles as charge storage nodes. The proposed strategy can be readily adapted for fabricating next generation (sub-20 nm node) non-volatile memory devices.

  18. Flexible subunit stoichiometry of functional human P2X2/3 heteromeric receptors.

    PubMed

    Kowalski, Maria; Hausmann, Ralf; Schmid, Julia; Dopychai, Anke; Stephan, Gabriele; Tang, Yong; Schmalzing, Günther; Illes, Peter; Rubini, Patrizia

    2015-12-01

    The aim of the present work was to clarify whether heterotrimeric P2X2/3 receptors have a fixed subunit stoichiometry consisting of one P2X2 and two P2X3 subunits as previously suggested, or a flexible stoichiometry containing also the inverse subunit composition. For this purpose we transfected HEK293 cells with P2X2 and P2X3 encoding cDNA at the ratios of 1:2 and 4:1, and analysed the biophysical and pharmacological properties of the generated receptors by means of the whole-cell patch-clamp technique. The concentration-response curves for the selective agonist α,β-meATP did not differ from each other under the two transfection ratios. However, co-expression of an inactive P2X2 mutant and the wild type P2X3 subunit and vice versa resulted in characteristic distortions of the α,β-meATP concentration-response relationships, depending on which subunit was expressed in excess, suggesting that HEK293 cells express mixtures of (P2X2)1/(P2X3)2 and (P2X2)2/(P2X3)1 receptors. Whereas the allosteric modulators H+ and Zn2+ failed to discriminate between the two possible heterotrimeric receptor variants, the α,β-meATP-induced responses were blocked more potently by the competitive antagonist A317491, when the P2X2 subunit was expressed in deficit of the P2X3 subunit. Furthermore, blue-native PAGE analysis of P2X2 and P2X3 subunits co-expressed in Xenopus laevis oocytes and HEK293 cells revealed that plasma membrane-bound P2X2/3 receptors appeared in two clearly distinct heterotrimeric complexes: a (P2X2-GFP)2/(P2X3)1 complex and a (P2X2-GFP)1/(P2X3)2 complex. These data strongly indicate that the stoichiometry of the heteromeric P2X2/3 receptor is not fixed, but determined in a permutational manner by the relative availability of P2X2 and P2X3 subunits.

  19. EUV reticle inspection with a 193nm reticle inspector

    NASA Astrophysics Data System (ADS)

    Broadbent, William; Inderhees, Gregg; Yamamoto, Tetsuya; Lee, Isaac; Lim, Phillip

    2013-06-01

    The prevailing industry opinion is that EUV Lithography (EUVL) will enter High Volume Manufacturing (HVM) in the 2015 - 2017 timeframe at the 16nm HP node. Every year the industry assesses the key risk factors for introducing EUVL into HVM - blank and reticle defects are among the top items. To reduce EUV blank and reticle defect levels, high sensitivity inspection is needed. To address this EUV inspection need, KLA-Tencor first developed EUV blank inspection and EUV reticle inspection capability for their 193nm wavelength reticle inspection system - the Teron 610 Series (2010). This system has become the industry standard for 22nm / 3xhp optical reticle HVM along with 14nm / 2xhp optical pilot production; it is further widely used for EUV blank and reticle inspection in R and D. To prepare for the upcoming 10nm / 1xhp generation, KLA-Tencor has developed the Teron 630 Series reticle inspection system which includes many technical advances; these advances can be applied to both EUV and optical reticles. The advanced capabilities are described in this paper with application to EUV die-to-database and die-to-die inspection for currently available 14nm / 2xhp generation EUV reticles. As 10nm / 1xhp generation optical and EUV reticles become available later in 2013, the system will be tested to identify areas for further improvement with the goal to be ready for pilot lines in early 2015.

  20. A novel double patterning approach for 30nm dense holes

    NASA Astrophysics Data System (ADS)

    Hsu, Dennis Shu-Hao; Wang, Walter; Hsieh, Wei-Hsien; Huang, Chun-Yen; Wu, Wen-Bin; Shih, Chiang-Lin; Shih, Steven

    2011-04-01

    Double Patterning Technology (DPT) was commonly accepted as the major workhorse beyond water immersion lithography for sub-38nm half-pitch line patterning before the EUV production. For dense hole patterning, classical DPT employs self-aligned spacer deposition and uses the intersection of horizontal and vertical lines to define the desired hole patterns. However, the increase in manufacturing cost and process complexity is tremendous. Several innovative approaches have been proposed and experimented to address the manufacturing and technical challenges. A novel process of double patterned pillars combined image reverse will be proposed for the realization of low cost dense holes in 30nm node DRAM. The nature of pillar formation lithography provides much better optical contrast compared to the counterpart hole patterning with similar CD requirements. By the utilization of a reliable freezing process, double patterned pillars can be readily implemented. A novel image reverse process at the last stage defines the hole patterns with high fidelity. In this paper, several freezing processes for the construction of the double patterned pillars were tested and compared, and 30nm double patterning pillars were demonstrated successfully. A variety of different image reverse processes will be investigated and discussed for their pros and cons. An economic approach with the optimized lithography performance will be proposed for the application of 30nm DRAM node.

  1. Magneto-optical trap for metastable helium at 389 nm

    SciTech Connect

    Koelemeij, J.C.J.; Stas, R.J.W.; Hogervorst, W.; Vassen, W.

    2003-05-01

    We have constructed a magneto-optical trap (MOT) for metastable triplet helium atoms utilizing the 2 {sup 3}S{sub 1}{yields}3 {sup 3}P{sub 2} line at 389 nm as the trapping and cooling transition. The far-red-detuned MOT (detuning {delta}=-41 MHz) typically contains few times 10{sup 7} atoms at a relatively high ({approx}10{sup 9} cm{sup -3}) density, which is a consequence of the large momentum transfer per photon at 389 nm and a small two-body loss rate coefficient (2x10{sup -10} cm{sup 3}/s<{beta}<1.0x10{sup -9} cm{sup 3}/s). The two-body loss rate is more than five times smaller than in a MOT on the commonly used 2 {sup 3}S{sub 1}{yields}2 {sup 3}P{sub 2} line at 1083 nm. Furthermore, laser cooling at 389 nm results in temperatures somewhat lower than those achieved using 1083 nm. The 389-nm MOT exhibits small losses due to two-photon ionization, which have been investigated as well.

  2. Mobility Patterns Informing V2X Research Projects: Eco-Routing and Electrified Roadway Project Examples

    SciTech Connect

    Gonder, Jeff; Brooker, Aaron; Burton, Evan; Wang, Lijuan; Wood, Eric

    2016-05-19

    Presentation given at an 'Expert Workshop on V2X Enabled Electric Vehicles' hosted at NREL on behalf of the International Energy Agency (IEA) Hybrid and Electric Vehicle Implementing Agreement for Task 28: Home Grids and V2X Technologies.

  3. Optimum ArFi laser bandwidth for 10nm node logic imaging performance

    NASA Astrophysics Data System (ADS)

    Alagna, Paolo; Zurita, Omar; Timoshkov, Vadim; Wong, Patrick; Rechtsteiner, Gregory; Baselmans, Jan; Mailfert, Julien

    2015-03-01

    Lithography process window (PW) and CD uniformity (CDU) requirements are being challenged with scaling across all device types. Aggressive PW and yield specifications put tight requirements on scanner performance, especially on focus budgets resulting in complicated systems for focus control. In this study, an imec N10 Logic-type test vehicle was used to investigate the E95 bandwidth impact on six different Metal 1 Logic features. The imaging metrics that track the impact of light source E95 bandwidth on performance of hot spots are: process window (PW), line width roughness (LWR), and local critical dimension uniformity (LCDU). In the first section of this study, the impact of increasing E95 bandwidth was investigated to observe the lithographic process control response of the specified logic features. In the second section, a preliminary assessment of the impact of lower E95 bandwidth was performed. The impact of lower E95 bandwidth on local intensity variability was monitored through the CDU of line end features and the LWR power spectral density (PSD) of line/space patterns. The investigation found that the imec N10 test vehicle (with OPC optimized for standard E95 bandwidth of300fm) features exposed at 200fm showed pattern specific responses, suggesting areas of potential interest for further investigation.

  4. Correlation between reticle- and wafer-CD difference of multiple 28nm reticle-sites

    NASA Astrophysics Data System (ADS)

    Ning, Guoxiang; Richter, Frank; Thamm, Thomas; Ackmann, Paul; Staples, Marc; Weisbuch, Francois; Kurth, Karin; Schenker, Joerg; Leschok, Andre; GN, Fang Hong

    2012-11-01

    Reticle critical dimension uniformity (CDU) is an important criterion for the qualification of mask layer processes. Normally, the smaller the three sigma value of reticle CDU is, the better is the reticle CDU performance. For qualification of mask processes, the mask layers to be qualified should have a comparable reticle CDU compared to the process of record (POR) mask layers. Because the reticle critical dimension (CD) measurement is based on algorithms like "middle side lobe measurement", evaluation of the reticle CD-values can not reflect aspects like the sidewall angle of the reticle and variation in corner rounding which may be critical for 45nm technology nodes (and below). All involved tools and processes contribute to the wafer intra-field CDU (scanner, track, reticle, metrology). Normally, the reticle contribution to the wafer CDU should be as small as possible. In order to reduce the process contributions to the wafer intra-field CDU during the mask qualification process, the same toolset (exposure tool, metrology tool) should be applied as for the POR. Out of the results of these investigations the correlation between wafer measurement to target (MTT) and reticle MTT can be obtained in order to accurately qualify the CDU performance of the mask processes. We will demonstrate the correlation between reticle MTT and wafer MTT by use of multiple mask processes and alternative mask blank materials. We will investigate the results of four process-layers looking at advanced binary maskblank material from two different suppliers (moreover the results of a 2X-via layer as an example for a phase-shift maskblank is discussed). Objective of this article is to demonstrate the distribution between reticle MTT and wafer MTT as a qualification criterion for mask processes. The correlation between wafer CD-difference and reticle CD-difference of these mask processes are demonstrated by having performed investigations of dense features of different 28nmtechnology

  5. SU(2) x U(1) vacuum and the Centauro events

    NASA Technical Reports Server (NTRS)

    Kazanas, D.; Balasubrahmanyan, V. K.; Streitmatter, R. E.

    1984-01-01

    It is proposed that the fireballs invoked to explain the Centauro events are bubbles of a metastable superdense state of nuclear matter, created in high energy (E is approximately 10 to the 15th power eV) cosmic ray collisions at the top of the atmosphere. If these bubbles are created with a Lorentz factor gamma approximately = 10 at their CM frame, the objections against the origin of these events in cosmic ray interactions are overcome. Assuming further, that the Centauro events are to the explosive decay of these metastable bubbles, a relationship between their lifetime, tau, and the threshold energy for bubble formation, E sub th, is derived. The minimum lifetime consistent with such an interpretation in tau is approximately 10 to the -8th power sec, while the E sub th appears to be insensitive to the value of tau and always close to E sub th is approximately 10 to the 15th power eV. Finally it is speculated that if the available CM energy is thermalized in such collisions, these bubbles might be manifestations of excitations of the SU(2) x U(1) false vacuum. The absence of neutral pions in the Centauro events is then explained by the decay of these excitations.

  6. Reticulin and NM23 staining in the interpretation of lymph nodal nevus rests.

    PubMed

    Kanner, William A; Barry, Catherine I; Smart, Chandra N; Frishberg, David P; Binder, Scott W; Wick, Mark R

    2013-06-01

    Melanocytic nevus rests in lymph nodes are a known diagnostic challenge, especially in patients with a history of melanoma. Reticulin and NM23 have been studied in this context. The pattern of reticulin staining in melanomas surrounds groups/nests of melanocytes but individual cells in benign nevi. NM23, a metastasis-suppressor gene, has an association with metastatic potential in melanomas and some carcinomas. Twenty-eight cases (14 cases of metastatic melanoma to lymph nodes and 14 cases of lymph node nevus rests, all confirmed with Melan-A staining) were stained with reticulin and NM23. The pattern of reticulin staining was reported as surrounding groups if staining was noted in approximately 5-10 melanocytes in greater than 50% of the lesion but was otherwise reported as surrounding individual melanocytes. Cytoplasmic staining was considered to represent reactivity for NM23. Reticulin staining around groups of melanocytes was identified in all 14 cases of metastatic melanoma. Regarding nodal nevus rest cases, 12 of 14 cases (86%) demonstrated staining around individual melanocytes, whereas in 2 cases, reticulin surrounded melanocytic groups. NM23 staining was equivocal in all cases. Reticulin staining reliably invests groups of melanocytes in cases of metastatic melanoma, whereas in nodal nevus rests, it predominantly surrounds individual melanocytes. NM23 demonstrated no discriminatory value in this analysis. In cases in which a collection of melanocytes is present within a lymph node, reticulin deposition around individual melanocytes supports a diagnosis of lymph nodal nevus rest.

  7. Charge distribution and oxygen diffusion in hyperstoichiometric uranium dioxide UO2+x (x ⩽ 0.25)

    NASA Astrophysics Data System (ADS)

    Skomurski, F. N.; Wang, J. W.; Ewing, R. C.; Becker, U.

    2013-03-01

    Quantum-mechanical techniques were used to determine the charge distribution of U atoms in UO2+x (x ⩽ 0.25) and to calculate activation-energy barriers to oxygen diffusion. Upon optimization, the reduction in unit-cell volume relative to UO2, and the shortest and bond-lengths (0.22 and 0.24 nm, respectively) are in good agreement with experimental data. The addition of interstitial oxygen to the unoccupied cubic sites in the UO2 structure deflects two nearest-neighbor oxygen atoms along the body diagonal of uranium-occupied cubic sites, creating lattice oxygen defects. In (1 × 1 × 2) supercells, the partial oxidation of two U4+ atoms is observed for every interstitial oxygen added to the structure, consistent with previous quantum-mechanical studies. Results favor the stabilization of two U5+ over one U6+ in UO2+x. Calculated activation energies (2.06-2.73 eV) and diffusion rates for oxygen in UO2+x support the idea that defect clusters likely play an increasingly important role as oxidation proceeds.

  8. X1X1X2X2/X1X2Y sex chromosome systems in the Neotropical Gymnotiformes electric fish of the genus Brachyhypopomus

    PubMed Central

    Cardoso, Adauto Lima; Pieczarka, Julio Cesar; Nagamachi, Cleusa Yoshiko

    2015-01-01

    Several types of sex chromosome systems have been recorded among Gymnotiformes, including male and female heterogamety, simple and multiple sex chromosomes, and different mechanisms of origin and evolution. The X1X1X2X2/X1X2Y systems identified in three species of this order are considered homoplasic for the group. In the genus Brachyhypopomus, only B. gauderio presented this type of system. Herein we describe the karyotypes of Brachyhypopomus pinnicaudatus and B. n. sp. FLAV, which have an X1X1X2X2/X1X2Y sex chromosome system that evolved via fusion between an autosome and the Y chromosome. The morphology of the chromosomes and the meiotic pairing suggest that the sex chromosomes of B. gauderio and B. pinnicaudatus have a common origin, whereas in B . n. sp. FLAV the sex chromosome system evolved independently. However, we cannot discard the possibility of common origin followed by distinct processes of differentiation. The identification of two new karyotypes with an X1X1X2X2/X1X2Y sex chromosome system in Gymnotiformes makes it the most common among the karyotyped species of the group. Comparisons of these karyotypes and the evolutionary history of the taxa indicate independent origins for their sex chromosomes systems. The recurrent emergence of the X1X1X2X2/X1X2Y system may represent sex chromosomes turnover events in Gymnotiformes. PMID:26273225

  9. Vibrational relaxation of O2(X3Σ(-)g, v = 6-8) by collisions with O2(X3Σ(-)g, v = 0): solution of the problems in the integrated profiles method.

    PubMed

    Watanabe, Shinji; Kohguchi, Hiroshi; Yamasaki, Katsuyoshi

    2012-08-02

    The linear kinetic analysis called the integrated profiles method (IPM) makes it simple to analyze the multistep relaxation processes of vibrational manifold. The problem that plots for linear regression in the IPM analysis cannot be made, however, has been found in the study of self relaxation of O2(X3Σ(-)g, v = 6-8). The cause of the problem is the identical time-dependence of the populations of the adjacent vibrational levels. An addition of CF4 into the system made a difference in the time profiles and enabled us to make IPM analysis and determine the rate coefficients. In the experiments, a gaseous mixture of O3/O2/CF4 in an Ar carrier at 298 K was irradiated at 266 nm, and the direct photoproduct O2(X3Σ(-)g, v = 6-9) from O3 was detected by laser-induced fluorescence (LIF)in the B3Σu-X3Σ(-)g transition. Time-resolved LIF intensities of O2(X3Σ(-)g, v) at various pressures of O2 and fixed pressure of CF4 were recorded. The resulting rate coefficients for v = 6−8 correlate smoothly with those for v ≤ 5 and v ≥ 8 reported previously.The vibrational-level dependence (v = 2-13) of the rate coefficients for relaxation of O2(X3Σ(-)g, v) by O2 is accounted for by the balance between the harmonic transition probabilities and the energy defect in the V-V energy-transfer mechanism.

  10. 32 nm imprint masks using variable shape beam pattern generators

    NASA Astrophysics Data System (ADS)

    Selinidis, Kosta; Thompson, Ecron; Schmid, Gerard; Stacey, Nick; Perez, Joseph; Maltabes, John; Resnick, Douglas J.; Yeo, Jeongho; Kim, Hoyeon; Eynon, Ben

    2008-05-01

    Imprint lithography has been included on the ITRS Lithography Roadmap at the 32, 22 and 16 nm nodes. Step and Flash Imprint Lithography (S-FIL ®) is a unique method that has been designed from the beginning to enable precise overlay for creating multilevel devices. A photocurable low viscosity monomer is dispensed dropwise to meet the pattern density requirements of the device, thus enabling imprint patterning with a uniform residual layer across a field and across entire wafers. Further, S-FIL provides sub-100 nm feature resolution without the significant expense of multi-element, high quality projection optics or advanced illumination sources. However, since the technology is 1X, it is critical to address the infrastructure associated with the fabrication of templates. For sub-32 nm device manufacturing, one of the major technical challenges remains the fabrication of full-field 1x templates with commercially viable write times. Recent progress in the writing of sub-40 nm patterns using commercial variable shape e-beam tools and non-chemically amplified resists has demonstrated a very promising route to realizing these objectives, and in doing so, has considerably strengthened imprint lithography as a competitive manufacturing technology for the sub 32nm node. Here we report the first imprinting results from sub-40 nm full-field patterns, using Samsung's current flash memory production device design. The fabrication of the template is discussed and the resulting critical dimension control and uniformity are discussed, along with image placement results. The imprinting results are described in terms of CD uniformity, etch results, and overlay.

  11. Full-field imprinting of sub-40 nm patterns

    NASA Astrophysics Data System (ADS)

    Yeo, Jeongho; Kim, Hoyeon; Eynon, Ben

    2008-03-01

    Imprint lithography has been included on the ITRS Lithography Roadmap at the 32, 22 and 16 nm nodes. Step and Flash Imprint Lithography (S-FIL (R)) is a unique patterning method that has been designed from the beginning to enable precise overlay to enable multilevel device fabrication. A photocurable low viscosity resist is dispensed dropwise to match the pattern density requirements of the device, thus enabling patterning with a uniform residual layer thickness across a field and across multiple wafers. Further, S-FIL provides sub-50 nm feature resolution without the significant expense of multi-element projection optics or advanced illumination sources. However, since the technology is 1X, it is critical to address the infrastructure associated with the fabrication of imprint masks (templates). For sub-32 nm device manufacturing, one of the major technical challenges remains the fabrication of full-field 1x imprint masks with commercially viable write times. Recent progress in the writing of sub-40 nm patterns using commercial variable shape e-beam tools and non-chemically amplified resists has demonstrated a very promising route to realizing these objectives, and in doing so, has considerably strengthened imprint lithography as a competitive manufacturing technology for the sub-32nm node. Here we report the first imprinting results from sub-40 nm full-field patterns, using Samsung's current flash memory production device design. The fabrication of the imprint mask and the resulting critical dimension control and uniformity are discussed, along with image placement results. The imprinting results are described in terms of CD uniformity, etch results, and overlay.

  12. Ionotropic P2X ATP Receptor Channels Mediate Purinergic Signaling in Mouse Odontoblasts

    PubMed Central

    Shiozaki, Yuta; Sato, Masaki; Kimura, Maki; Sato, Toru; Tazaki, Masakazu; Shibukawa, Yoshiyuki

    2017-01-01

    ATP modulates various functions in the dental pulp cells, such as intercellular communication and neurotransmission between odontoblasts and neurons, proliferation of dental pulp cells, and odontoblast differentiation. However, functional expression patterns and their biophysical properties of ionotropic ATP (P2X) receptors (P2X1–P2X7) in odontoblasts were still unclear. We examined these properties of P2X receptors in mouse odontoblasts by patch-clamp recordings. K+-ATP, nonselective P2X receptor agonist, induced inward currents in odontoblasts in a concentration-dependent manner. K+-ATP-induced currents were inhibited by P2X4 and P2X7 selective inhibitors (5-BDBD and KN62, respectively), while P2X1 and P2X3 inhibitors had no effects. P2X7 selective agonist (BzATP) induced inward currents dose-dependently. We could not observe P2X1, 2/3, 3 selective agonist (αβ-MeATP) induced currents. Amplitudes of K+-ATP-induced current were increased in solution without extracellular Ca2+, but decreased in Na+-free extracellular solution. In the absence of both of extracellular Na+ and Ca2+, K+-ATP-induced currents were completely abolished. K+-ATP-induced Na+ currents were inhibited by P2X7 inhibitor, while the Ca2+ currents were sensitive to P2X4 inhibitor. These results indicated that odontoblasts functionally expressed P2X4 and P2X7 receptors, which might play an important role in detecting extracellular ATP following local dental pulp injury. PMID:28163685

  13. Identifying node importance in complex networks

    NASA Astrophysics Data System (ADS)

    Hu, Ping; Fan, Wenli; Mei, Shengwei

    2015-07-01

    In this paper, we propose a novel node importance evaluation method from the perspective of the existence of mutual dependence among nodes. The node importance comprises its initial importance and the importance contributions from both the adjacent and non-adjacent nodes according to the dependence strength between them. From the simulation analyses on an example network and the ARPA network, we observe that our method can well identify the node importance. Then, the cascading failures on the Netscience and E-mail networks demonstrate that the networks are more vulnerable when continuously removing the important nodes identified by our method, which further proves the accuracy of our method.

  14. Self-Rectifying Resistive Switching Memory with Ultralow Switching Current in Pt/Ta2O5/HfO2- x /Hf Stack

    NASA Astrophysics Data System (ADS)

    Ma, Haili; Feng, Jie; Lv, Hangbing; Gao, Tian; Xu, Xiaoxin; Luo, Qing; Gong, Tiancheng; Yuan, Peng

    2017-02-01

    In this study, we present a bilayer resistive switching memory device with Pt/Ta2O5/HfO2- x /Hf structure, which shows sub-1 μA ultralow operating current, median switching voltage, adequate ON/OFF ratio, and simultaneously containing excellent self-rectifying characteristics. The control sample with single HfO2- x structure shows bidirectional memory switching properties with symmetrical I-V curve in low resistance state. After introducing a 28-nm-thick Ta2O5 layer on HfO2- x layer, self-rectifying phenomena appeared, with a maximum self-rectifying ratio (RR) of 4 × 103 observed at ±0.5 V. Apart from being a series resistance for the cell, the Ta2O5 rectifying layer also served as an oxygen reservoir which remains intact during the whole switching cycle.

  15. Controlling data transfers from an origin compute node to a target compute node

    DOEpatents

    Archer, Charles J.; Blocksome, Michael A.; Ratterman, Joseph D.; Smith, Brian E.

    2011-06-21

    Methods, apparatus, and products are disclosed for controlling data transfers from an origin compute node to a target compute node that include: receiving, by an application messaging module on the target compute node, an indication of a data transfer from an origin compute node to the target compute node; and administering, by the application messaging module on the target compute node, the data transfer using one or more messaging primitives of a system messaging module in dependence upon the indication.

  16. Polymorphism in 2-X-adamantane derivatives (X = Cl, Br).

    PubMed

    Negrier, Philippe; Barrio, María; Tamarit, Josep Ll; Mondieig, Denise

    2014-08-14

    The polymorphism of two 2-X-adamantane derivatives, X = Cl, X = Br, has been studied by X-ray powder diffraction and normal- and high-pressure (up to 300 MPa) differential scanning calorimetry. 2-Br-adamantane displays a low-temperature orthorhombic phase (space group P212121, Z = 4) and a high-temperature plastic phase (Fm3̅m, Z = 4) from 277.9 ± 1.0 K to the melting point at 413.4 ± 1.0 K. 2-Cl-adamantane presents a richer polymorphic behavior through the temperature range studied. At low temperature it displays a triclinic phase (P1̅, Z = 2), which transforms to a monoclinic phase (C2/c, Z = 8) at 224.4 ± 1.0 K, both phases being ordered. Two high-temperature orientationally disordered are found for this compound, one hexagonal (P63/mcm, Z = 6) at ca. 241 K and the highest one, cubic (Fm3̅m, Z = 4), being stable from 244 ± 1.0 K up to the melting point at 467.5 ± 1.0 K. No additional phase appears due to the increase in pressure within the studied range. The intermolecular interactions are found to be weak, especially for the 2-Br-adamantane compound for which the Br···Br as well as C-Br···H distances are larger than the addition of the van der Waals radii, thus confirming the availability of this compound for building up diamondoid blocks.

  17. Probing hydrodesulfurization over bimetallic phosphides using monodisperse Ni2-xMxP nanoparticles encapsulated in mesoporous silica

    NASA Astrophysics Data System (ADS)

    Danforth, Samuel J.; Liyanage, D. Ruchira; Hitihami-Mudiyanselage, Asha; Ilic, Boris; Brock, Stephanie L.; Bussell, Mark E.

    2016-06-01

    Metal phosphide nanoparticles encapsulated in mesoporous silica provide a well-defined system for probing the fundamental chemistry of the hydrodesulfurization (HDS) reaction over this new class of hydrotreating catalysts. To investigate composition effects in bimetallic phosphides, the HDS of dibenzothiophene (DBT) was carried out over a series of Ni-rich Ni2-xMxP@mSiO2 (M = Co, Fe) nanocatalysts (x ≤ 0.50). The Ni2-xMxP nanoparticles (average diameters: 11-13 nm) were prepared by solution-phase arrested precipitation and encapsulated in mesoporous silica, characterized by a range of techniques (XRD, TEM, IR spectroscopy, BET surface area, CO chemisorption) and tested for DBT HDS activity and selectivity. The highest activity was observed for a Ni1.92Co0.08P@mSiO2 nanocatalyst, but the overall trend was a decrease in HDS activity with increasing Co or Fe content. In contrast, the highest turnover frequency (TOF) was observed for the most Co- and Fe-rich compositions based on sites titrated by CO chemisorption. IR spectral studies of adsorbed CO on the Ni2-xMxP@mSiO2 catalysts indicate that an increase in electron density occurs on Ni sites as the Co or Fe content is increased, which may be responsible for the increased TOFs of the catalytic sites. The Ni2-xMxP@mSiO2 nanocatalysts exhibit a strong preference for the direct desulfurization pathway (DDS) for DBT HDS that changes only slightly with increasing Co or Fe content.

  18. Spectroscopic investigation on tunable luminescence by energy transfer in Tb2-xSmx(MoO4)3 nanophosphors

    NASA Astrophysics Data System (ADS)

    Kamal, P. Mani; Vimal, G.; Biju, P. R.; Joseph, Cyriac; Unnikrishnan, N. V.; Ittyachen, M. A.

    2015-04-01

    New Sm3+ activated Tb2-xSmx(MoO4)3 nanophosphors were synthesized through sol-gel method. The structural and luminescence properties have been studied by XRD, TEM and photoluminescence measurements. The XRD pattern confirms that the Tb2-xSmx(MoO4)3 crystallizes in the same orthorhombic structure of Tb2(MoO4)3. The spectroscopic and laser parameters of Sm3+ ion in Tb2-x(MoO4)3 matrix were evaluated for the first time using Judd-Ofelt theoretical analysis. The higher value of stimulated emission cross-section of 4G5/2 → 6H7/2 transition of Sm3+ is favorable for low threshold and high gain to obtain continuous wave laser action. The photoluminescence excitation spectra suggest that this novel phosphor can be excited over a broad range from nUV to blue light (300-490 nm). Under the excitation of UV, Tb2-xSmx(MoO4)3 nanophosphor exhibits the characteristic emissions of Tb3+ and Sm3+. By varying the doping concentration of Sm3+, the emission color of the phosphors can be tuned and white emission in a single composition can be obtained under host excitation, in which an energy transfer from MoO42- → Sm3+/ Tb3+ and Tb3+ → Sm3+ was observed. The investigation of the luminescence decay curves and lifetime values implies the energy transfer between Tb3+ → Sm3+ and confirms the absence of Sm3+ → Tb3+ energy transfer. These phosphors might be a promising material for use in nUV LEDs and can exhibit tricolor luminescence under single excitation wavelength.

  19. Underwater Sensor Nodes and Networks

    PubMed Central

    Lloret, Jaime

    2013-01-01

    Sensor technology has matured enough to be used in any type of environment. The appearance of new physical sensors has increased the range of environmental parameters for gathering data. Because of the huge amount of unexploited resources in the ocean environment, there is a need of new research in the field of sensors and sensor networks. This special issue is focused on collecting recent advances on underwater sensors and underwater sensor networks in order to measure, monitor, surveillance of and control of underwater environments. On the one hand, from the sensor node perspective, we will see works related with the deployment of physical sensors, development of sensor nodes and transceivers for sensor nodes, sensor measurement analysis and several issues such as layer 1 and 2 protocols for underwater communication and sensor localization and positioning systems. On the other hand, from the sensor network perspective, we will see several architectures and protocols for underwater environments and analysis concerning sensor network measurements. Both sides will provide us a complete view of last scientific advances in this research field. PMID:24013489

  20. Histopathology of the Lymph Nodes

    PubMed Central

    Elmore, Susan A.

    2007-01-01

    Lymph nodes function as filters of tissues and tissue fluids and are sites of origin and production of lymphocytes for normal physiological functions. As part of this normal function, they react to both endogenous and exogenous substances with a variety of specific morphological and functional responses. Lesions can be both proliferative and nonproliferative, and can be treatment-related or not. The histological evaluation of lymph nodes is necessary in order to understand the immunotoxic effects of chemicals with the resulting data providing an important component of human risk assessment. It is the challenge of the toxicologic pathologist to interpret the pathology data within the complete clinical evaluation of the entire animal. Daily insults, ageing and toxins can alter the normal histology and primary function of lymph nodes. Therefore it is important to distinguish and differentiate lesions that occur naturally during normal development and ageing from those that are induced by xenobiotics. To achieve this goal, comparison with strain- age- and sex-matched controls is crucial. PMID:17067938

  1. P2X receptors in the cardiovascular system and their potential as therapeutic targets in disease.

    PubMed

    Ralevic, Vera

    2015-01-01

    This review considers the expression and roles of P2X receptors in the cardiovascular system in health and disease and their potential as therapeutic targets. P2X receptors are ligand gated ion channels which are activated by the endogenous ligand ATP. They are formed from the assembly of three P2X subunit proteins from the complement of seven (P2X1-7), which can associate to form homomeric or heteromeric P2X receptors. The P2X1 receptor is widely expressed in the cardiovascular system, being located in the heart, in the smooth muscle of the majority of blood vessels and in platelets. P2X1 receptors expressed in blood vessels can be activated by ATP coreleased with noradrenaline as a sympathetic neurotransmitter, leading to smooth muscle depolarisation and contraction. There is evidence that the purinergic component of sympathetic neurotransmission is increased in hypertension, identifying P2X1 receptors as a possible therapeutic target in this disorder. P2X3 and P2X2/3 receptors are expressed on cardiac sympathetic neurones and may, through positive feedback of neuronal ATP at this prejunctional site, amplify sympathetic neurotransmission. Activation of P2X receptors expressed in the heart increases cardiac myocyte contractility, and an important role of the P2X4 receptor in this has been identified. Deletion of P2X4 receptors in the heart depresses contractile performance in models of heart failure, while overexpression of P2X4 receptors has been shown to be cardioprotective, thus P2X4 receptors may be therapeutic targets in the treatment of heart disease. P2X receptors have been identified on endothelial cells. Although immunoreactivity for all P2X1-7 receptor proteins has been shown on the endothelium, relatively little is known about their function, with the exception of the endothelial P2X4 receptor, which has been shown to mediate endothelium-dependent vasodilatation to ATP released during shear stress. The potential of P2X receptors as therapeutic targets

  2. Process variation aware OPC modeling for leading edge technology nodes

    NASA Astrophysics Data System (ADS)

    Zhang, Qiaolin; Croffie, Ebo; Fan, Yongfa; Li, Jianliang; Lucas, Kevin; Falch, Brad; Melvin, Lawerence

    2009-03-01

    As the semiconductor industry moves to the 45nm node and beyond, the tolerable lithography process window significantly shrinks due to the combined use of high NA and low k1 factor. This is exacerbated by the fact that the usable depth of focus at 45nm node for critical layer is 200nm or less. Traditional Optical Proximity Correction (OPC) only computes the optimal pattern layout to optimize its lithography patterning at nominal process condition (nominal defocus and nominal exposure dose) according to an OPC model calibrated at this nominal condition, and this may put the post-OPC layout at non-negligible patterning failure risk due to the inevitable process variation (mainly defocus and dose variations). With a little sacrifice at the nominal condition, process variation aware OPC can greatly enhance the robustness of post-OPC layout patterning in the presence of defocus and dose variation. There is also an increasing demand for through process window lithography verification for post-OPC circuit layout. The corner stone for successful process variation aware OPC and lithography verification is an accurately calibrated continuous process window model which is a continuous function of defocus and dose. This calibrated model needs to be able to interpolate and extrapolate in the usable process window. Based on Synopsys' OPC modeling software package-ProGen and ProGenPlus, we developed an automated process window (PW) modeling module, which can build process variation aware process window OPC model with continuously adjustable process parameters: defocus and dose. The calibration of this continuous PW model was performed in a single calibration process using silicon measurement at nominal condition and off-focus-off-dose conditions. Through the example of several process window models for layers at 45nm technology nodes, we demonstrated that this novel continuous PW modeling approach can achieve very good performance both at nominal condition and at interpolated or

  3. Axillary Lymph Nodes and Breast Cancer

    MedlinePlus

    ... more likely to affect arm function and cause lymphedema. For this reason, sentinel node biopsy is the ... OR supraclavicular (above the clavicle) nodes have cancer Lymphedema Lymphedema [lim-fa-DEE-ma] is a build- ...

  4. Formation of tin-tin oxide core-shell nanoparticles in the composite SnO2-x/nitrogen-doped carbon nanotubes by pulsed ion beam irradiation

    NASA Astrophysics Data System (ADS)

    Korusenko, P. M.; Nesov, S. N.; Bolotov, V. V.; Povoroznyuk, S. N.; Pushkarev, A. I.; Ivlev, K. E.; Smirnov, D. A.

    2017-03-01

    The complex methods of transmission electron microscopy, energy dispersive X-ray analysis, and X-ray photoelectron spectroscopy were used to investigate the changes in the morphology, phase composition, and electronic structure of the composite SnO2-x/nitrogen-doped multiwalled carbon nanotubes (SnO2-x/N-MWCNTs) irradiated with the pulsed ion beam of nanosecond duration. The irradiation of the composite SnO2-x/N-MWCNTs leads to the formation of nanoparticles with the core-shell structure on the surface of CNTs with a sharp interfacial boundary. It has been established that the "core" is a metal tin (Sn0) with a typical size of 5-35 nm, and the "shell" is a thin amorphous layer (2-6 nm) consisting of nonstoichiometric tin oxide with a low oxygen content. The "core-shell" structure Snsbnd SnOx is formed due to the process of heating and evaporation of SnO2-x under the effect of the ion beam, followed by vapor deposition on the surface of carbon nanotubes.

  5. The analysis of polarization characteristics on 40nm memory devices

    NASA Astrophysics Data System (ADS)

    Yoo, Minae; Park, Chanha; You, Taejun; Yang, Hyunjo; Min, Young-Hong; Park, Ki-Yeop; Yim, Donggyu; Park, Sungki

    2009-03-01

    Hyper NA system has been introduced to develop sub-60nm node memory devices. Especially memory industries including DRAM and NAND Flash business have driven much finer technology to improve productivity. Polarization at hyper NA has been well known as important optical technology to enhance imaging performance and also achieve very low k1 process. The source polarization on dense structure has been used as one of the major RET techniques. The process capabilities of various layers under specific illumination and polarization have been explored. In this study, polarization characteristic on 40nm memory device will be analyzed. Especially, TE (Transverse Electric) polarization and linear X-Y polarization on hyper NA ArF system will be compared and investigated. First, IPS (Intensity in Preferred State) value will be measured with PMM (Polarization Metrology Module) to confirm polarization characteristic of each machine before simulation. Next simulation will be done to estimate the CD variation impact of each polarization to different illumination. Third, various line and space pattern of DRAM and Flash device will be analyzed under different polarized condition to see the effect of polarization on CD of actual wafer. Finally, conclusion will be made for this experiment and future work will be discussed. In this paper, the behavior of 40nm node memory devices with two types of polarization is presented and the guidelines for polarization control is discussed based on the patterning performances.

  6. Expression, assembly and function of novel C-terminal truncated variants of the mouse P2X7 receptor: re-evaluation of P2X7 knockouts

    PubMed Central

    Masin, Marianela; Young, Christopher; Lim, KoiNi; Barnes, Sara J; Xu, Xing Jian; Marschall, Viola; Brutkowski, Wojciech; Mooney, Elizabeth R; Gorecki, Dariusz C; Murrell-Lagnado, Ruth

    2012-01-01

    BACKGROUND AND PURPOSE Splice variants of P2X7 receptor transcripts contribute to the diversity of receptor-mediated responses. Here, we investigated expression and function of C-terminal truncated (ΔC) variants of the mP2X7 receptor, which are predicted to escape inactivation in one strain of P2X7−/− mice (Pfizer KO). EXPERIMENTAL APPROACH Expression in wild-type (WT) and Pfizer KO tissue was investigated by reverse transcription (RT)-PCR and Western blot analysis. ΔC variants were also cloned and expressed in HEK293 cells to investigate their assembly, trafficking and function. KEY RESULTS RT-PCR indicates expression of a ΔC splice variant in brain, salivary gland (SG) and spleen from WT and Pfizer KO mice. An additional ΔC hybrid transcript, containing sequences of P2X7 upstream of exon 12, part of exon 13 followed in-frame by the sequence of the vector used to disrupt the P2X7 gene, was also identified in the KO mice. By blue native (BN) PAGE analysis and the use of cross linking reagents followed by SDS-PAGE, P2X7 trimers, dimers and monomers were detected in the spleen and SG of Pfizer KO mice. The molecular mass was reduced compared with P2X7 in WT mice tissue, consistent with a ΔC variant. When expressed in HEK293 cells the ΔC variants were inefficiently trafficked to the cell surface and agonist-evoked whole cell currents were small. Co-expressed with P2X7A, the ΔC splice variant acted in a dominant negative fashion to inhibit function. CONCLUSIONS AND IMPLICATIONS Pfizer KO mice are not null for P2X7 receptor expression but express ΔC variants with reduced function. PMID:21838754

  7. Nodal gap behavior of Bi2Sr2-xLnxCuO6+δ (Ln = La, Eu) investigated by specific heat measurements

    NASA Astrophysics Data System (ADS)

    Shimizu, M.; Moriya, Y.; Baar, S.; Momono, N.; Amakai, Y.; Takano, H.; Murayama, S.; Kurosawa, T.; Oda, M.; Ido, M.

    2015-08-01

    We performed low-temperature specific heat measurements on slightly underdoped samples of monolayer cuprate superconductors Bi2Sr2-xLnxCuO6+δ (Ln = La, Eu, Ln-Bi2201) under magnetic fields H. In La-Bi2201, the coefficient γ of T-linear term in the electronic specific heat Cel at T ≪ Tc shows H dependence, as expected in dx2-y2 -wave superconductors. In Eu-Bi2201, γ shows almost the same H dependence as that of La-Bi2201 below H ˜ 2 T, while γ is suppressed above H ˜ 2 T and deviates downward from the H curve of La-Bi2201. This result suggests the the gap and the electronic excitation spectrum near nodes are modified in Eu-Bi2201 except the region of the Fermi surface in the immediate vicinity of nodes.

  8. Z2 x Z3 Symmetry of Multferroic Vortices

    NASA Astrophysics Data System (ADS)

    Cheong, Sang-Wook

    2014-03-01

    Hexagonal REMnO3 (RE = rare earths) with RE =Ho-Lu, Y, and Sc, is an improper ferroelectric where the size mismatch between RE and Mn induces a trimerization-type structural phase transition, and this structural transition leads to three structural domains, each of which can support two directions of ferroelectric polarization. We reported that domains in h-REMnO3 meet in cloverleaf arrangements that cycle through all six domain configurations, Occurring in pairs, the cloverleafs can be viewed as vortices and antivortices, in which the cycle of domain configurations is reversed. Vortices and antivortices are topological defects: even in a strong electric field they won't annihilate. These ferroelectric vortices/antivortices are found to be associated with intriguing collective magnetism at domain walls, reflecting the multiferroic nature of vortices. We have found that an intriguing, but seemingly irregular network of a zoo of multiferroic vortices and antivortices in h-REMnO3 can be neatly analyzed in terms of graph theory, and this graph theoretical analysis reveals the emergence of Z2 × Z3 symmetry in the vortices/antivortices network. In addition, poling or self-poling due to a surface charge boundary condition induces global topological condensation of the network through breaking of the Z2 part of the Z2 × Z3 symmetry. The opposite process of restoring the Z2 symmetry can be considered as topological evaporation. It turns out that these Z2xZ3 vortices are, in fact, three-dimensional vortex loops, which result from the emergent continuous U(1) symmetry near the critical temperature. This spontaneous trapping of topological defects in the process of undergoing a continuous phase transition is important to understand numerous novel phenomena such as the early stage of universe after big bang. The so-called Kibble-Zurek mechanism was proposed for the trapping process of topological defects right after big bang. It appears that the Kibble-Zurek mechanism is also

  9. Epitaxial growth and properties of MoOx(2<x <2.75) films

    NASA Astrophysics Data System (ADS)

    Bhosle, V.; Tiwari, A.; Narayan, J.

    2005-04-01

    We report the growth of epitaxial molybdenum oxide (MoOx,2<x<2.75) films on c plane of sapphire substrate using pulsed laser deposition in oxygen environment. The structure was characterized using x-ray diffraction, high resolution transmission electron microscopy and x-ray photoelectron spectroscopy (XPS). Electrical resistivity and optical properties were investigated using four-point-probe resistivity measurements and spectroscopy techniques, respectively. It was found that the film had a monoclinic structure based on MoO2 phase and showed an unusual combination of high conductivity and high transmittance in the visible region after annealing. The unusual combination of these properties was realized by systematically controlling the relative fraction of different oxidation states of molybdenum, namely Mo4+, Mo5+, and Mo6+ in the monoclinic phase. For a film 60nm thick and annealed at 250°C for 1h, the ratio of Mo6+/(Mo4++Mo5+) was determined to be ˜2.9/1 using XPS, and a typical value of transmittance was ˜65% and resistivity close to 1×10-3Ωcm. These results demonstrate growth of epitaxial MoOx films with tunable electrical and optical properties. Further optimization of these properties is expected to result in applications related to display panels, solar cells, chromogenic (photochromic, electrochromic, gasochromic) devices, and transparent conducting oxides. Our ability to grow epitaxial MoOx films can further aid their integration with optoelectronic and photonic devices.

  10. Sol-gel synthesis of Y xGd 2- xSiO 5:Eu 3+ phosphors derived from the in situ assembly of multicomponent hybrid precursors

    NASA Astrophysics Data System (ADS)

    Huang, Honghua; Yan, Bing

    2006-04-01

    Using rare earth coordination polymers with salicylic acid as precursors for the luminescence species Y xGd 2- xSiO 5:Eu 3+, composing the polyvinyl alcohol (PVA) as dispersing media, nanophosphors of Y xGd 2- xSiO 5:Eu 3+ ( x = 0.10, 0.25, 0.50, 0.75, 0.90) with different molar ratio of Y and Gd were synthesized by the sol-gel process. Both X-ray diffraction and scanning electronic microscope show that these materials have the nanometer size of 100-200 nm. These nanometer materials exhibit red emission at 612 nm. When x = 0.5, Y 0.5Gd 1.5SiO 5:Eu 3+ shows the strongest emission intensity comparing with other molar ratio of Y to Gd.

  11. Synthesis, crystal structure and luminescence properties of CaY2-xEuxGe3O10 (x=0-2)

    NASA Astrophysics Data System (ADS)

    Lipina, Olga A.; Surat, Ludmila L.; Melkozerova, Marina A.; Tyutyunnik, Alexander P.; Leonidov, Ivan I.; Zubkov, Vladimir G.

    2013-10-01

    The novel red emitting phosphors based on CaY2-xEuxGe3O10 (x=0-2) have been prepared using both a conventional solid-state reaction and a synthesis route via EDTA-complexing process. Powder XRD study has revealed that CaY2-xEuxGe3O10 (x=0.1-0.8, 2.0) crystallizes in the monoclinic space group P21/c, Z=4. The trivalent europium ions occupy three different sites (4e) with the C1 symmetry. The phosphors exhibit a strong red emission under excitations at 250 nm and 393 nm. The light emission efficiency depends on the excitation wavelength, the activator content and the method of synthesis. Appropriate CIE chromaticity coordinates for CaY1.7Eu0.3Ge3O10 are x=0.54 and y=0.29.

  12. A scaled quantum mechanical force field for the sulfuryl halides. I. The symmetric halides SO2X2 (X=F, Cl, Br).

    PubMed

    Fernández, L E; Verón, M G; Varetti, E L

    2004-01-01

    Force fields and vibrational wavenumbers were calculated for the molecules SO2X2 (X=F, Cl, Br) using DFT techniques. The previously available experimental data and assignments for SO2F2 and SO2Cl2 were compared with the theoretical results and revised, and new low temperature infrared and Raman data were obtained for SO2Cl2. These data were subsequently used in the definition of scaled quantum mechanics force fields for such molecules. Adjusted wavenumbers were also predicted for the still unknown SO2Br2. A comparison is made with results published for the VO2X2- anions.

  13. A scaled quantum mechanical force field for the sulfuryl halides. I. The symmetric halides SO 2X 2 (X=F, Cl, Br)

    NASA Astrophysics Data System (ADS)

    Fernández, L. E.; Verón, M. G.; Varetti, E. L.

    2004-01-01

    Force fields and vibrational wavenumbers were calculated for the molecules SO 2X 2 (X=F, Cl, Br) using DFT techniques. The previously available experimental data and assignments for SO 2F 2 and SO 2Cl 2 were compared with the theoretical results and revised, and new low temperature infrared and Raman data were obtained for SO 2Cl 2. These data were subsequently used in the definition of scaled quantum mechanics force fields for such molecules. Adjusted wavenumbers were also predicted for the still unknown SO 2Br 2. A comparison is made with results published for the VO 2X 2- anions.

  14. T.Node, industrial version of supernode

    NASA Astrophysics Data System (ADS)

    Flieller, Sylvain

    1989-12-01

    The Esprit I P1085 "SuperNode" project developed a modular reconfigurable archtecture, based on transputers. This highly parallel machine is now marketed by Telmat Informatique under the name T.Node. This paper presents the P1085 project, the architecture of SuperNode, its industrial implementation and its software enviroment.

  15. Molecular and functional characterization of human P2X(2) receptors.

    PubMed

    Lynch, K J; Touma, E; Niforatos, W; Kage, K L; Burgard, E C; van Biesen, T; Kowaluk, E A; Jarvis, M F

    1999-12-01

    P2X receptors are a family of ATP-gated ion channels. Four cDNAs with a high degree of homology to the rat P2X(2) receptor were isolated from human pituitary and pancreas RNA. Genomic sequence indicated that these cDNAs represent alternatively spliced messages. Northern analysis revealed high levels of human P2X(2) (hP2X(2)) message in the pancreas, and splice variants could be detected in a variety of tissues. Two cDNAs encoded functional ion channels when expressed in Xenopus oocytes, a receptor structurally homologous to the prototype rat P2X(2) receptor (called hP2X(2a)) and a variant containing a deletion within its cytoplasmic C terminus (called hP2X(2b)). Pharmacologically, these functional human P2X(2) receptors were virtually indistinguishable, with the P2X receptor agonists ATP, 2-methylthio-ATP, 2' and 3'-O-(4-benzoylbenzoyl)-ATP, and ATP5'-O-(3-thiotriphosphate) being approximately equipotent (EC(50) = 1 microM) in eliciting extracellular Ca(2+) influx. The P2 receptor agonists alpha,beta-methylene ATP, adenosine, adenosine 5'-O-(2-thiodiphosphate), and UTP were inactive at concentrations up to 100 microM. Both hP2X(2a) and hP2X(2b) receptors were sensitive to the P2 receptor antagonist pyridoxal-5-phosphate-6-azophenyl-2', 4'-disulfonic acid (IC(50) = 3 microM). In contrast to the analogous rat P2X(2) and P2X(2b) receptors, the desensitization rates of the hP2X(2a) and hP2X(2b) receptors were equivalent. Both functional forms of the human P2X(2) receptors formed heteromeric channels with the human P2X(3) receptor. These data demonstrate that the gene structure and mRNA heterogeneity of the P2X(2) receptor subtype are evolutionarily conserved between rat and human, but also suggest that alternative splicing serves a function other than regulating the desensitization rate of the human receptor.

  16. Macrophage activation and polarization modify P2X7 receptor secretome influencing the inflammatory process

    PubMed Central

    de Torre-Minguela, Carlos; Barberà-Cremades, Maria; Gómez, Ana I.; Martín-Sánchez, Fátima; Pelegrín, Pablo

    2016-01-01

    The activation of P2X7 receptor (P2X7R) on M1 polarized macrophages induces the assembly of the NLRP3 inflammasome leading to the release of pro-inflammatory cytokines and the establishment of the inflammatory response. However, P2X7R signaling to the NLRP3 inflammasome is uncoupled on M2 macrophages without changes on receptor activation. In this study, we analyzed P2X7R secretome in wild-type and P2X7R-deficient macrophages polarized either to M1 or M2 and proved that proteins released after P2X7R stimulation goes beyond caspase-1 secretome. The characterization of P2X7R-secretome reveals a new function of this receptor through a fine-tuning of protein release. We found that P2X7R stimulation in macrophages is able to release potent anti-inflammatory proteins, such as Annexin A1, independently of their polarization state suggesting for first time a potential role for P2X7R during resolution of the inflammation and not linked to the release of pro-inflammatory cytokines. These results are of prime importance for the development of therapeutics targeting P2X7R. PMID:26935289

  17. Megahertz FDML laser with up to 143nm sweep range for ultrahigh resolution OCT at 1050nm

    NASA Astrophysics Data System (ADS)

    Kolb, Jan Philip; Klein, Thomas; Eibl, Matthias; Pfeiffer, Tom; Wieser, Wolfgang; Huber, Robert

    2016-03-01

    We present a new design of a Fourier Domain Mode Locked laser (FDML laser), which provides a new record in sweep range at ~1μm center wavelength: At the fundamental sweep rate of 2x417 kHz we reach 143nm bandwidth and 120nm with 4x buffering at 1.67MHz sweep rate. The latter configuration of our system is characterized: The FWHM of the point spread function (PSF) of a mirror is 5.6μm (in tissue). Human in vivo retinal imaging is performed with the MHz laser showing more details in vascular structures. Here we could measure an axial resolution of 6.0μm by determining the FWHM of specular reflex in the image. Additionally, challenges related to such a high sweep bandwidth such as water absorption are investigated.

  18. Pharmacological identification of P2X1, P2X4 and P2X7 nucleotide receptors in the smooth muscles of human umbilical cord and chorionic blood vessels.

    PubMed

    Valdecantos, P; Briones, R; Moya, P; Germain, A; Huidobro-Toro, J P

    2003-01-01

    To ascertain the role of extracellular adenosine 5'-triphosphate (ATP) receptors in human placenta circulation, we identified and pharmacologically characterized the P2X receptor population in its superficial vessels. Total RNA was extracted from segments of chorionic and umbilical arteries and veins of terminal placentae delivered by vaginal or Caesarian births. Polymerase chain reaction (PCR), followed by sequencing of the products, identified the presence of P2X 1, 4, 5, 6, and 7mRNAs in smooth muscle from chorionic and umbilical arteries and veins. Umbilical vessels proximal to the fetus expressed the same population of P2X subtypes, except for the P2X(5), but additionally expressed the P2X(2). Rings of chorionic vessels contracted upon addition of nucleotides and analogs with the following relative rank order of potencies in arteries and veins: alpha,beta-methyleneATP>beta,gamma-methyleneATP>PNP>ATP=diBzATP>2-MeSATP>ADP>AMP; in umbilical vessels alpha,beta-methyleneATP was at least 100-fold more potent than ATP. Nucleotide potency was less than that of PGF(2alpha) or endothelin-2, but had the same magnitude as serotonin. ATP-desensitized receptors evidenced cross desensitization to alpha,beta-methyleneATP, 2-MeSATP and diBzATP, effect not observed when desensitization was elicited by alpha,beta-methyleneATP, confirming the presence of various P2X receptor subtypes in the smooth muscles of these vessels. The vasocontractile efficacy of alpha,beta-methyleneATP was unaltered by endothelium removal, while that of ATP was significantly attenuated and those elicited by 2-MeSATP were blunted, indicating the presence of additional endothelial nucleotide receptors. These results suggest that P2X receptors participate in the humoral regulation of placental blood flow.

  19. Megasonic cleaning strategy for sub-10nm photomasks

    NASA Astrophysics Data System (ADS)

    Hsu, Jyh-Wei; Samayoa, Martin; Dress, Peter; Dietze, Uwe; Ma, Ai-Jay; Lin, Chia-Shih; Lai, Rick; Chang, Peter; Tuo, Laurent

    2016-10-01

    One of the main challenges in photomask cleaning is balancing particle removal efficiency (PRE) with pattern damage control. To overcome this challenge, a high frequency megasonic cleaning strategy is implemented. Apart from megasonic frequency and power, photomask surface conditioning also influences cleaning performance. With improved wettability, cleanliness is enhanced while pattern damage risk is simultaneously reduced. Therefore, a particle removal process based on higher megasonic frequencies, combined with proper surface pre-treatment, provides improved cleanliness without the unintended side effects of pattern damage, thus supporting the extension of megasonic cleaning technology into 10nm half pitch (hp) device node and beyond.

  20. Characterisation of P2X receptors expressed in rat pulmonary arteries.

    PubMed

    Syed, Nawazish-i-Husain; Tengah, Asrin; Paul, Andrew; Kennedy, Charles

    2010-12-15

    Previous studies indicated that a P2X receptor other than the P2X1 subtype might be present in rat large, but not small pulmonary arteries. The aim here was to characterise further these P2X receptors. Isometric tension was recorded from rat isolated small (i.d. 250-500 μm) and large pulmonary artery (i.d. 1-1.5 mm) rings mounted on a wire myograph. In both tissues the P2X receptor agonist α,β-meATP evoked rapidly-developing contractions that were inhibited by the P2X antagonists NF449, PPADS and suramin in a concentration-dependent manner and eventually abolished by each. The rank order of the potency in both tissues was NF449>PPADS=suramin. For each antagonist there was no significant difference between its potency in the small and large pulmonary arteries. Prolonged administration of a high concentration of α,β-meATP induced complete desensitisation in both tissues. RT-PCR followed by PCR with specific oligonucleotide primers, identified mRNA for all seven P2X subunits. Subtype-specific antibodies showed strong, punctate P2X1 receptor-like immunoreactivity in the majority of cells and faint, punctate staining with the anti-P2X2 and anti-P2X4 antibodies, whilst P2X5-like immunoreactivity was barely detectable and no P2X3, P2X6, and P2X7 receptor-like immunoreactivity was seen. No differences in P2X mRNA and protein expression were seen between small and large pulmonary arteries. In conclusion, the pharmacological properties and mRNA and protein expression profiles of P2X receptors in rat small and large pulmonary arteries are very similar. Thus P2X1 appears to be the predominant P2X subunit functionally expressed in smooth muscle cells of rat small and large pulmonary arteries.

  1. Role of purinergic P2X4 receptors in regulating striatal dopamine homeostasis and dependent behaviors.

    PubMed

    Khoja, Sheraz; Shah, Vivek; Garcia, Damaris; Asatryan, Liana; Jakowec, Michael W; Davies, Daryl L

    2016-10-01

    Purinergic P2X4 receptors (P2X4Rs) belong to the P2X superfamily of ion channels regulated by ATP. We recently demonstrated that P2X4R knockout (KO) mice exhibited deficits in sensorimotor gating, social interaction, and ethanol drinking behavior. Dopamine (DA) dysfunction may underlie these behavioral changes, but there is no direct evidence for P2X4Rs' role in DA neurotransmission. To test this hypothesis, we measured markers of DA function and dependent behaviors in P2X4R KO mice. P2X4R KO mice exhibited altered density of pre-synaptic markers including tyrosine hydroxylase, dopamine transporter; post-synaptic markers including dopamine receptors and phosphorylation of downstream targets including dopamine and cyclic-AMP regulated phosphoprotein of 32 kDa and cyclic-AMP-response element binding protein in different parts of the striatum. Ivermectin, an allosteric modulator of P2X4Rs, significantly affected dopamine and cyclic AMP regulated phosphoprotein of 32 kDa and extracellular regulated kinase1/2 phosphorylation in the striatum. Sensorimotor gating deficits in P2X4R KO mice were rescued by DA antagonists. Using the 6-hydroxydopamine model of DA depletion, P2X4R KO mice exhibited an attenuated levodopa (L-DOPA)-induced motor behavior, whereas ivermectin enhanced this behavior. Collectively, these findings identified an important role for P2X4Rs in maintaining DA homeostasis and illustrate how this association is important for CNS functions including motor control and sensorimotor gating. We propose that P2X4 receptors (P2X4Rs) regulate dopamine (DA) homeostasis and associated behaviors. Pre-synaptic and post-synaptic DA markers were significantly altered in the dorsal and ventral striatum of P2X4R KO mice, implicating altered DA neurotransmission. Sensorimotor gating deficits in P2X4R KO mice were rescued by DA antagonists. Ivermectin (IVM), a positive modulator of P2X4Rs, enhanced levodopa (L-DOPA)-induced motor behavior. These studies highlight potential

  2. Structural transformation in nano-structured CuAl{sub x}Cr{sub x}Fe{sub 2-2x}O{sub 4} system

    SciTech Connect

    Mehta, D. K.; Chhantbar, M. C.; Joshi, H. H.

    2015-06-24

    Polycrystalline spinel ferrite system CuAl{sub x}Cr{sub x}Fe{sub 2-2x}O{sub 4} (x=0.2, 0.6) was synthesized by solid-state reaction route. Nanoparticles of the samples have been prepared by using high energy ball milling technique with different milling durations and characterized by X-ray Diffraction and Tunneling Electron Microscope. It is observed that the structural transformation occurred from Cubic to tetragonal and particle size varied between 29 nm -14 nm with increase of milling time.

  3. Residual Chemoresponsiveness to Acids in the Superior Laryngeal Nerve in “Taste-Blind” (P2X2/P2X3 Double-KO) Mice

    PubMed Central

    Ohkuri, Tadahiro; Horio, Nao; Stratford, Jennifer M.; Finger, Thomas E.; Ninomiya, Yuzo

    2012-01-01

    Mice lacking both the P2X2 and the P2X3 purinergic receptors (P2X-dblKO) exhibit loss of responses to all taste qualities in the taste nerves innervating the tongue. Similarly, these mice exhibit a near total loss of taste-related behaviors in brief access tests except for a near-normal avoidance of acidic stimuli. This persistent avoidance of acids despite the loss of gustatory neural responses to sour was postulated to be due to continued responsiveness of the superior laryngeal (SL) nerve. However, chemoresponses of the larynx are attributable both to taste buds and to free nerve endings. In order to test whether the SL nerve of P2X-dblKO mice remains responsive to acids but not to other tastants, we recorded responses from the SL nerve in wild-type (WT) and P2X-dblKO mice. WT mice showed substantial SL responses to monosodium glutamate, sucrose, urea, and denatonium—all of which were essentially absent in P2X-dblKO animals. In contrast, the SL nerve of P2X-dblKO mice exhibited near-normal responses to citric acid (50 mM) although responsiveness of both the chorda tympani and the glossopharyngeal nerves to this stimulus were absent or greatly reduced. These results are consistent with the hypothesis that the residual avoidance of acidic solutions by P2X-dblKO mice may be attributable to the direct chemosensitivity of nerve fibers innervating the laryngeal epithelium and not to taste. PMID:22362867

  4. MPEG-DSPE polymeric micelle for translymphatic chemotherapy of lymph node metastasis.

    PubMed

    Li, Xue; Dong, Qing; Yan, Zhiqiang; Lu, Weiyue; Feng, Lingling; Xie, Cao; Xie, Zuoxu; Su, Bingxia; Liu, Min

    2015-06-20

    Lymph node metastasis is one of the major pathways for tumor formation and it is difficult to deliver chemotherapeutics at therapeutic concentrations to lymph node metastasis. This study prepared methyl poly(ethylene glycol)-distearoylphosphatidylethanolamine/doxorubicin (MPEG-DSPE/DOX) micelle for the treatment of lymph node metastasis. The MPEG-DSPE/DOX micelle prepared were of spherical morphology with a particle size of 20 ± 5 nm. The uptake rates of DOX and MPEG-DSPE/DOX micelle by A375 cells were 51.2% and 88.7%, respectively. The phagocytosis rate of MPEG-DSPE/Rhodamine B micelle by RAW264.7 cells was 17.2-fold lower than for Rhodamine B alone. After subcutaneous injection, MPEG-DSPE micelle underwent lymphatic absorption and accumulated in popliteal lymph nodes. MPEG-DSPE/DOX micelle significantly alleviated damage to the subcutaneous tissue of the injection sites compared with DOX alone. We established a model of nude mice bearing lymph node metastasis of A375 cells. After subcutaneous injection, the weights of both the popliteal and iliac lymph nodes of the MPEG-DSPE/DOX micelle group were significantly lower than in the saline and DOX groups. MPEG-DSPE/DOX micelle effectively killed the tumor cells in popliteal and iliac lymph nodes. In conclusion, MPEG-DSPE micelle is a promising drug delivery system for the treatment of lymph node metastasis.

  5. The sentinel node in gynaecological malignancies

    PubMed Central

    Balega, J; Van Trappen, P O

    2006-01-01

    As lymph node metastasis is one of the earliest features of tumour cell spread in most human cancers, assessment of the regional lymph nodes is required for tumour staging, determining prognosis and planning adjuvant therapeutic strategies. However, complete lymph node dissections are frequently associated with significant complications. Conjugating the diagnostic advantages with decreased morbidity, the sentinel node concept represents one of the most recent advances in surgical oncology. In this review we briefly highlight the historical background of the development of the sentinel node concept, the anatomical evidence for applying the sentinel node concept in pelvic gynaecological cancers and the technical aspects of sentinel node detection. We discuss recent studies in vulval, cervical and endometrial cancer. PMID:16520291

  6. Dedicated heterogeneous node scheduling including backfill scheduling

    DOEpatents

    Wood, Robert R.; Eckert, Philip D.; Hommes, Gregg

    2006-07-25

    A method and system for job backfill scheduling dedicated heterogeneous nodes in a multi-node computing environment. Heterogeneous nodes are grouped into homogeneous node sub-pools. For each sub-pool, a free node schedule (FNS) is created so that the number of to chart the free nodes over time. For each prioritized job, using the FNS of sub-pools having nodes useable by a particular job, to determine the earliest time range (ETR) capable of running the job. Once determined for a particular job, scheduling the job to run in that ETR. If the ETR determined for a lower priority job (LPJ) has a start time earlier than a higher priority job (HPJ), then the LPJ is scheduled in that ETR if it would not disturb the anticipated start times of any HPJ previously scheduled for a future time. Thus, efficient utilization and throughput of such computing environments may be increased by utilizing resources otherwise remaining idle.

  7. P2X7 deficiency attenuates hypertension and renal injury in deoxycorticosterone acetate-salt hypertension.

    PubMed

    Ji, Xu; Naito, Yukiko; Weng, Huachun; Endo, Kosuke; Ma, Xiao; Iwai, Naoharu

    2012-10-15

    The P2X(7) receptor is a ligand-gated ion channel, and genetic variations in the P2X(7) gene significantly affect blood pressure. P2X(7) receptor expression is associated with renal injury and inflammatory diseases. Uninephrectomized wild-type (WT) and P2X(7)-deficient (P2X(7) KO) mice were subcutaneously implanted with deoxycorticosterone acetate (DOCA) pellets and fed an 8% salt diet for 18 days. Their blood pressure was assessed by a telemetry system. The mice were placed in metabolic cages, and urine was collected for 24 h to assess renal function. After 18 days of DOCA-salt treatment, P2X(7) mRNA and protein expression increased in WT mice. Blood pressure in P2X(7) KO mice was less than that of WT mice (mean systolic blood pressure 133 ± 3 vs. 150 ± 2 mmHg). On day 18, urinary albumin excretion was lower in P2X(7) KO mice than in WT mice (0.11 ± 0.07 vs. 0.28 ± 0.07 mg/day). Creatinine clearance was higher in P2X(7) KO mice than in WT mice (551.53 ± 65.23 vs. 390.85 ± 32.81 μl·min(-1)·g renal weight(-1)). Moreover, renal interstitial fibrosis and infiltration of immune cells (macrophages, T cells, B cells, and leukocytes) were markedly attenuated in P2X(7) KO mice compared with WT mice. The levels of IL-1β, released by macrophages, in P2X(7) KO mice had decreased dramatically compared with that in WT mice. These results strongly suggest that the P2X(7) receptor plays a key role in the development of hypertension and renal disease via increased inflammation, indicating its potential as a novel therapeutic target.

  8. Immunolocalization of the P2X4 receptor on neurons and glia in the mammalian retina.

    PubMed

    Ho, T; Vessey, K A; Fletcher, E L

    2014-09-26

    Extracellular adenosine 5'-triphosphate (eATP) acts as a neurotransmitter within the retina and brain, activating a range of ionotropic P2X and metabotropic P2Y receptors. In this study, the specific localization of the P2X4 receptor (P2X4-R) subunit was evaluated in the retina using fluorescence immunohistochemistry and pre-embedding immuno-electron microscopy. Punctate P2X4-R labeling was largely localized to the inner and outer plexiform layers of mouse, rat and cat retinae. In the mouse outer retina, double-labeling of P2X4-R with the horizontal cell marker, calbindin, revealed P2X4-R immunoreactivity (P2X4-R-IR) on horizontal cell somata and processes. In the inner retina, P2X4-R expression was found closely associated with rod and cone bipolar cell terminals, and the punctate labeling was observed on calretinin-positive amacrine cells. Using immuno-electron microscopy, P2X4-Rs were observed on processes post-synaptic to photoreceptor and bipolar cell terminals, likely representing horizontal, amacrine and ganglion cells, respectively. Furthermore, P2X4-R expression was also observed on Müller cells, astrocytes and microglia. These data suggest a role for P2X4-Rs in the lateral inhibitory pathways of the retina, modulating neuronal function of photoreceptors and bipolar cells. The expression on macro- and microglial cells implicates a role for P2X4-Rs in glial signaling, tissue homeostasis and immunosurveillance within the mammalian retina.

  9. Sociocommunicative and Sensorimotor Impairments in Male P2X4-Deficient Mice

    PubMed Central

    Wyatt, Letisha R; Godar, Sean C; Khoja, Sheraz; Jakowec, Michael W; Alkana, Ronald L; Bortolato, Marco; Davies, Daryl L

    2013-01-01

    Purinergic P2X receptors are a family of ligand-gated ion channels gated by extracellular adenosine 5′-triphosphate (ATP). Of the seven P2X subtypes, P2X4 receptors (P2X4Rs) are richly expressed in the brain, yet their role in behavioral organization remains poorly understood. In this study, we examined the behavioral responses of P2X4R heterozygous (HZ) and knockout (KO) mice in a variety of testing paradigms designed to assess complementary aspects of sensory functions, emotional reactivity, and cognitive organization. P2X4R deficiency did not induce significant alterations of locomotor activity and anxiety-related indices in the novel open field and elevated plus-maze tests. Conversely, P2X4R KO mice displayed marked deficits in acoustic startle reflex amplitude, as well as significant sensorimotor gating impairments, as assessed by the prepulse inhibition of the startle. In addition, P2X4R KO mice displayed enhanced tactile sensitivity, as signified by a lower latency in the sticky-tape removal test. Moreover, both P2X4R HZ and KO mice showed significant reductions in social interaction and maternal separation-induced ultrasonic vocalizations in pups. Notably, brain regions of P2X4R KO mice exhibited significant brain-regional alterations in the subunit composition of glutamate ionotropic receptors. These results collectively document that P2X4-deficient mice exhibit a spectrum of phenotypic abnormalities partially akin to those observed in other murine models of autism-spectrum disorder. In conclusion, our findings highlight a putative role of P2X4Rs in the regulation of perceptual and sociocommunicative functions and point to these receptors as putative targets for disturbances associated with neurodevelopmental disorders. PMID:23604007

  10. Novel Protective Role of Endogenous Cardiac Myocyte P2X4 Receptors in Heart Failure

    PubMed Central

    Yang, Tiehong; Shen, Jian-bing; Yang, Ronghua; Redden, John; Dodge-Kafka, Kimberly; Grady, James; Jacobson, Kenneth A.; Liang, Bruce T.

    2014-01-01

    Background Heart failure (HF), despite continuing progress, remains a leading cause of mortality and morbidity. P2X4 receptors (P2X4R) have emerged as potentially important molecules in regulating cardiac function and as potential targets for HF therapy. Transgenic P2X4R overexpression can protect against HF, but this does not explain the role of native cardiac P2X4R. Our goal is to define the physiological role of endogenous cardiac myocyte P2X4R under basal conditions and during HF induced by myocardial infarction or pressure overload. Methods and Results Mice established with conditional cardiac-specific P2X4R knockout were subjected to left anterior descending coronary artery ligation–induced postinfarct or transverse aorta constriction–induced pressure overload HF. Knockout cardiac myocytes did not show P2X4R by immunoblotting or by any response to the P2X4R-specific allosteric enhancer ivermectin. Knockout hearts showed normal basal cardiac function but depressed contractile performance in postinfarct and pressure overload models of HF by in vivo echocardiography and ex vivo isolated working heart parameters. P2X4R coimmunoprecipitated and colocalized with nitric oxide synthase 3 (eNOS) in wild-type cardiac myocytes. Mice with cardiac-specific P2X4R overexpression had increased S-nitrosylation, cyclic GMP, NO formation, and were protected from postinfarct and pressure overload HF. Inhibitor of eNOS, L-N5-(1-iminoethyl)ornithine hydrochloride, blocked the salutary effect of cardiac P2X4R overexpression in postinfarct and pressure overload HF as did eNOS knockout. Conclusions This study establishes a new protective role for endogenous cardiac myocyte P2X4R in HF and is the first to demonstrate a physical interaction between the myocyte receptor and eNOS, a mediator of HF protection. PMID:24622244

  11. Diadenosine Homodinucleotide Products of ADP-ribosyl Cyclases Behave as Modulators of the Purinergic Receptor P2X7*

    PubMed Central

    Bruzzone, Santina; Basile, Giovanna; Chothi, Madhu Parakkottil; Nobbio, Lucilla; Usai, Cesare; Jacchetti, Emanuela; Schenone, Angelo; Guse, Andreas H.; Di Virgilio, Francesco; De Flora, Antonio; Zocchi, Elena

    2010-01-01

    ADP-ribosyl cyclases from both vertebrates and invertebrates were previously shown to produce two isomers of P1,P2 diadenosine 5′,5′"-P1, P2-diphosphate, P18 and P24, from cyclic ADP-ribose (cADPR) and adenine. P18 and P24 are characterized by an unusual N-glycosidic linkage in one of the adenylic mononucleotides (Basile, G., Taglialatela-Scafati, O., Damonte, G., Armirotti, A., Bruzzone, S., Guida, L., Franco, L., Usai, C., Fattorusso, E., De Flora, A., and Zocchi, E. (2005) Proc. Natl. Acad. Sci. U.S.A. 102, 14509–14514). P24, but not P18, proved to increase the intracellular Ca2+ concentration ([Ca2+]i) in HeLa cells and to negatively affect mitochondrial function. Here we show that micromolar P24, but not P18, triggers a slow and sustained influx of extracellular Ca2+ through the opening of the purinergic receptor/channel P2X7. On the other hand, P18 inhibits the Ca2+ influx induced by 0.6 mm ATP in HEK293 cells stably transfected with P2X7, with an IC50 of ∼1 μm. Thus, P18 is devoid of intrinsic P2X7 stimulatory activity and behaves as an ATP antagonist. A P2X7-mediated increase of the basal [Ca2+]i has been demonstrated to negatively affect Schwann cell (SC) function in rats with the inherited, peripheral neuropathy Charcot-Marie-Tooth 1A (CMT1A) (Nobbio, L., Sturla, L., Fiorese, F., Usai, C., Basile, G., Moreschi, I., Benvenuto, F., Zocchi, E., De Flora, A., Schenone, A., and Bruzzone S. (2009) J. Biol. Chem. 284, 23146–23158). Preincubation of CMT1A SC with 200 nm P18 restored the basal [Ca2+]i to values similar to those recorded in wild-type SC. These results identify P18 as a new P2X7 antagonist, potentially useful in the treatment of CMT1A. PMID:20439466

  12. Lipopolysaccharide Inhibits the Channel Activity of the P2X7 Receptor

    PubMed Central

    Leiva-Salcedo, Elias; Coddou, Claudio; Rodríguez, Felipe E.; Penna, Antonello; Lopez, Ximena; Neira, Tanya; Fernández, Ricardo; Imarai, Mónica; Rios, Miguel; Escobar, Jorge; Montoya, Margarita; Huidobro-Toro, J. Pablo; Escobar, Alejandro; Acuña-Castillo, Claudio

    2011-01-01

    The purinergic P2X7 receptor (P2X7R) plays an important role during the immune response, participating in several events such as cytokine release, apoptosis, and necrosis. The bacterial endotoxin lipopolysaccharide (LPS) is one of the strongest stimuli of the immune response, and it has been shown that P2X7R activation can modulate LPS-induced responses. Moreover, a C-terminal binding site for LPS has been proposed. In order to evaluate if LPS can directly modulate the activity of the P2X7R, we tested several signaling pathways associated with P2X7R activation in HEK293 cells that do not express the TLR-4 receptor. We found that LPS alone was unable to induce any P2X7R-related activity, suggesting that the P2X7R is not directly activated by the endotoxin. On the other hand, preapplication of LPS inhibited ATP-induced currents, intracellular calcium increase, and ethidium bromide uptake and had no effect on ERK activation in HEK293 cells. In splenocytes-derived T-regulatory cells, in which ATP-induced apoptosis is driven by the P2X7R, LPS inhibited ATP-induced apoptosis. Altogether, these results demonstrate that LPS modulates the activity of the P2X7R and suggest that this effect could be of physiological relevance. PMID:21941410

  13. Insights into the channel gating of P2X receptors from structures, dynamics and small molecules

    PubMed Central

    Wang, Jin; Yu, Ye

    2016-01-01

    P2X receptors, as ATP-gated non-selective trimeric ion channels, are permeable to Na+, K+ and Ca2+. Comparing with other ligand-gated ion channel families, P2X receptors are distinct in their unique gating properties and pathophysiological roles, and have attracted attention as promising drug targets for a variety of diseases, such as neuropathic pain, multiple sclerosis, rheumatoid arthritis and thrombus. Several small molecule inhibitors for distinct P2X subtypes have entered into clinical trials. However, many questions regarding the gating mechanism of P2X remain unsolved. The structural determinations of P2X receptors at the resting and ATP-bound open states revealed that P2X receptor gating is a cooperative allosteric process involving multiple domains, which marks the beginning of the post-structure era of P2X research at atomic level. Here, we review the current knowledge on the structure-function relationship of P2X receptors, depict the whole picture of allosteric changes during the channel gating, and summarize the active sites that may contribute to new strategies for developing novel allosteric drugs targeting P2X receptors. PMID:26725734

  14. Accelerated tumor progression in mice lacking the ATP receptor P2X7.

    PubMed

    Adinolfi, Elena; Capece, Marina; Franceschini, Alessia; Falzoni, Simonetta; Giuliani, Anna L; Rotondo, Alessandra; Sarti, Alba C; Bonora, Massimo; Syberg, Susanne; Corigliano, Domenica; Pinton, Paolo; Jorgensen, Niklas R; Abelli, Luigi; Emionite, Laura; Raffaghello, Lizzia; Pistoia, Vito; Di Virgilio, Francesco

    2015-02-15

    The ATP receptor P2X7 (P2X7R or P2RX7) has a key role in inflammation and immunity, but its possible roles in cancer are not firmly established. In the present study, we investigated the effect of host genetic deletion of P2X7R in the mouse on the growth of B16 melanoma or CT26 colon carcinoma cells. Tumor size and metastatic dissemination were assessed by in vivo calliper and luciferase luminescence emission measurements along with postmortem examination. In P2X7R-deficient mice, tumor growth and metastatic spreading were accelerated strongly, compared with wild-type (wt) mice. Intratumoral IL-1β and VEGF release were drastically reduced, and inflammatory cell infiltration was abrogated nearly completely. Similarly, tumor growth was also greatly accelerated in wt chimeric mice implanted with P2X7R-deficient bone marrow cells, defining hematopoietic cells as a sufficient site of P2X7R action. Finally, dendritic cells from P2X7R-deficient mice were unresponsive to stimulation with tumor cells, and chemotaxis of P2X7R-less cells was impaired. Overall, our results showed that host P2X7R expression was critical to support an antitumor immune response, and to restrict tumor growth and metastatic diffusion.

  15. Critical current density and flux pinning in La 2- xPr xCa 2 x Ba 2Cu 4+2 xO z ( x=0.1-0.5) superconductors

    NASA Astrophysics Data System (ADS)

    Rayaprol, S.; Thaker, C. M.; Shah, N. A.; Kuberkar, D. G.

    2004-07-01

    Polycrystalline La 2- xPr xCa 2 xBa 2Cu 4+2 xO z (LPCaBCO) compounds with x=0.1-0.5 were synthesized by solid-state reaction method and studied by room temperature X-ray diffraction, dc resistivity, dc magnetization and iodometry. The superconducting transition temperatures in these tetragonal triple perovskite compounds increases from 32 to 62 K ( Tconset values) with increasing dopant concentration. The mixing of rare earth La 3+ and Pr 3+/4+ ions at rare earth site (La 3+) along with substitution of divalent Ca 2+ results in the shrinkage of unit cell volume. The contraction of unit cell volume due to larger ion being substituted by smaller ions, gives rise to creation of pinning centres in the unit cell leading to increase in critical current density and flux pinning.

  16. P2X4 receptors (P2X4Rs) represent a novel target for the development of drugs to prevent and/or treat alcohol use disorders

    PubMed Central

    Franklin, Kelle M.; Asatryan, Liana; Jakowec, Michael W.; Trudell, James R.; Bell, Richard L.; Davies, Daryl L.

    2014-01-01

    Alcohol use disorders (AUDs) have a staggering socioeconomic impact. Few therapeutic options are available, and they are largely inadequate. These shortcomings highlight the urgent need to develop effective medications to prevent and/or treat AUDs. A critical barrier is the lack of information regarding the molecular target(s) by which ethanol (EtOH) exerts its pharmacological activity. This review highlights findings implicating P2X4 receptors (P2X4Rs) as a target for the development of therapeutics to treat AUDs and discusses the use of ivermectin (IVM) as a potential clinical tool for treatment of AUDs. P2XRs are a family of ligand-gated ion channels (LGICs) activated by extracellular ATP. Of the P2XR subtypes, P2X4Rs are expressed the most abundantly in the CNS. Converging evidence suggests that P2X4Rs are involved in the development and progression of AUDs. First, in vitro studies report that pharmacologically relevant EtOH concentrations can negatively modulate ATP-activated currents. Second, P2X4Rs in the mesocorticolimbic dopamine system are thought to play a role in synaptic plasticity and are located ideally to modulate brain reward systems. Third, alcohol-preferring (P) rats have lower functional expression of the p2rx4 gene than alcohol-non-preferring (NP) rats suggesting an inverse relationship between alcohol intake and P2X4R expression. Similarly, whole brain p2rx4 expression has been shown to relate inversely to innate 24 h alcohol preference across 28 strains of rats. Fourth, mice lacking the p2rx4 gene drink more EtOH than wildtype controls. Fifth, IVM, a positive modulator of P2X4Rs, antagonizes EtOH-mediated inhibition of P2X4Rs in vitro and reduces EtOH intake and preference in vivo. These findings suggest that P2X4Rs contribute to EtOH intake. The present review summarizes recent findings focusing on the P2X4R as a molecular target of EtOH action, its role in EtOH drinking behavior and modulation of its activity by IVM as a potential therapy

  17. Design strategy for integrating DSA via patterning in sub-7 nm interconnects

    NASA Astrophysics Data System (ADS)

    Karageorgos, Ioannis; Ryckaert, Julien; Tung, Maryann C.; Wong, H.-S. P.; Gronheid, Roel; Bekaert, Joost; Karageorgos, Evangelos; Croes, Kris; Vandenberghe, Geert; Stucchi, Michele; Dehaene, Wim

    2016-03-01

    In recent years, major advancements have been made in the directed self-assembly (DSA) of block copolymers (BCPs). As a result, the insertion of DSA for IC fabrication is being actively considered for the sub-7nm nodes. At these nodes the DSA technology could alleviate costs for multiple patterning and limit the number of litho masks that would be required per metal layer. One of the most straightforward approaches for DSA implementation would be for via patterning through templated DSA, where hole patterns are readily accessible through templated confinement of cylindrical phase BCP materials. Our in-house studies show that decomposition of via layers in realistic circuits below the 7nm node would require at least many multi-patterning steps (or colors), using 193nm immersion lithography. Even the use of EUV might require double patterning in these dimensions, since the minimum via distance would be smaller than EUV resolution. The grouping of vias through templated DSA can resolve local conflicts in high density areas. This way, the number of required colors can be significantly reduced. For the implementation of this approach, a DSA-aware mask decomposition is required. In this paper, our design approach for DSA via patterning in sub-7nm nodes is discussed. We propose options to expand the list of DSA-compatible via patterns (DSA letters) and we define matching cost formulas for the optimal DSA-aware layout decomposition. The flowchart of our proposed approach tool is presented.

  18. A dual-modal magnetic nanoparticle probe for preoperative and intraoperative mapping of sentinel lymph nodes by magnetic resonance and near infrared fluorescence imaging.

    PubMed

    Zhou, Zhengyang; Chen, Hongwei; Lipowska, Malgorzata; Wang, Liya; Yu, Qiqi; Yang, Xiaofeng; Tiwari, Diana; Yang, Lily; Mao, Hui

    2013-07-01

    The ability to reliably detect sentinel lymph nodes for sentinel lymph node biopsy and lymphadenectomy is important in clinical management of patients with metastatic cancers. However, the traditional sentinel lymph node mapping with visible dyes is limited by the penetration depth of light and fast clearance of the dyes. On the other hand, sentinel lymph node mapping with radionucleotide technique has intrinsically low spatial resolution and does not provide anatomic details in the sentinel lymph node mapping procedure. This work reports the development of a dual modality imaging probe with magnetic resonance and near infrared imaging capabilities for sentinel lymph node mapping using magnetic iron oxide nanoparticles (10 nm core size) conjugated with a near infrared molecule with emission at 830 nm. Accumulation of magnetic iron oxide nanoparticles in sentinel lymph nodes leads to strong T2 weighted magnetic resonance imaging contrast that can be potentially used for preoperative localization of sentinel lymph nodes, while conjugated near infrared molecules provide optical imaging tracking of lymph nodes with a high signal to background ratio. The new magnetic nanoparticle based dual imaging probe exhibits a significant longer lymph node retention time. Near infrared signals from nanoparticle conjugated near infrared dyes last up to 60 min in sentinel lymph node compared to that of 25 min for the free near infrared dyes in a mouse model. Furthermore, axillary lymph nodes, in addition to sentinel lymph nodes, can be also visualized with this probe, given its slow clearance and sufficient sensitivity. Therefore, this new dual modality imaging probe with the tissue penetration and sensitive detection of sentinel lymph nodes can be applied for preoperative survey of lymph nodes with magnetic resonance imaging and allows intraoperative sentinel lymph node mapping using near infrared optical devices.

  19. Targeting of the P2X7 receptor in pancreatic cancer and stellate cells

    PubMed Central

    Giannuzzo, Andrea; Saccomano, Mara; Napp, Joanna; Ellegaard, Maria; Alves, Frauke

    2016-01-01

    The ATP‐gated receptor P2X7 (P2X7R) is involved in regulation of cell survival and has been of interest in cancer field. Pancreatic ductal adenocarcinoma (PDAC) is a deadly cancer and new markers and therapeutic targets are needed. PDAC is characterized by a complex tumour microenvironment, which includes cancer and pancreatic stellate cells (PSCs), and potentially high nucleotide/side turnover. Our aim was to determine P2X7R expression and function in human pancreatic cancer cells in vitro as well as to perform in vivo efficacy study applying P2X7R inhibitor in an orthotopic xenograft mouse model of PDAC. In the in vitro studies we show that human PDAC cells with luciferase gene (PancTu‐1 Luc cells) express high levels of P2X7R protein. Allosteric P2X7R antagonist AZ10606120 inhibited cell proliferation in basal conditions, indicating that P2X7R was tonically active. Extracellular ATP and BzATP, to which the P2X7R is more sensitive, further affected cell survival and confirmed complex functionality of P2X7R. PancTu‐1 Luc migration and invasion was reduced by AZ10606120, and it was stimulated by PSCs, but not by PSCs from P2X7‐/‐ animals. PancTu‐1 Luc cells were orthotopically transplanted into nude mice and tumour growth was followed noninvasively by bioluminescence imaging. AZ10606120‐treated mice showed reduced bioluminescence compared to saline‐treated mice. Immunohistochemical analysis confirmed P2X7R expression in cancer and PSC cells, and in metaplastic/neoplastic acinar and duct structures. PSCs number/activity and collagen deposition was reduced in AZ10606120‐treated tumours. PMID:27513892

  20. The effect of anions on the human P2X7 receptor.

    PubMed

    Kubick, Christoph; Schmalzing, Günther; Markwardt, Fritz

    2011-12-01

    P2X7 receptors (P2X7Rs) are nonselective cation channels that are opened by the binding of extracellular ATP and are involved in the modulation of epithelial secretion, inflammation and nociception. Here, we investigated the effect of extracellular anions on channel gating and permeation of human P2X7Rs (hP2X7Rs) expressed in Xenopus laevis oocytes. Two-microelectrode voltage-clamp recordings showed that ATP-induced hP2X7R-mediated currents increased when extracellular chloride was substituted by the organic anions glutamate or aspartate and decreased when chloride was replaced by the inorganic anions nitrate, sulfate or iodide. ATP concentration-response comparisons revealed that substitution of chloride by glutamate decreased agonist efficacy, while substitution by iodide increased agonist efficacy at high ATP concentrations. Meanwhile, the ATP potency remained unchanged. Activation of the hP2X7R at low ATP concentrations via the high-affinity ATP effector site was not affected by the replacement of chloride by glutamate or iodide. To analyze the anion effect on the hP2X7R at the single-molecule level, we performed single-channel current measurements using the patch-clamp technique in the outside-out configuration. Chloride substitution did not affect the single-channel conductance, but the probability that the P2X7R channel was open increased when chloride was replaced by glutamate and decreased when chloride was replaced by iodide. This effect was due to an influence of the anions on the mean closed times of the hP2X7R channel. We conclude that hP2X7R channels are not anion-permeable in physiological Na+-based media and that external anions allosterically affect ion channel opening in the fully ATP4-liganded P2X7R through an extracellular anion binding site.

  1. Caveolin-1 regulates P2X7 receptor signaling in osteoblasts.

    PubMed

    Gangadharan, Vimal; Nohe, Anja; Caplan, Jeffrey; Czymmek, Kirk; Duncan, Randall L

    2015-01-01

    The synthesis of new bone in response to a novel applied mechanical load requires a complex series of cellular signaling events in osteoblasts and osteocytes. The activation of the purinergic receptor P2X(7)R is central to this mechanotransduction signaling cascade. Recently, P2X(7)R have been found to be associated with caveolae, a subset of lipid microdomains found in several cell types. Deletion of caveolin-1 (CAV1), the primary protein constituent of caveolae in osteoblasts, results in increased bone mass, leading us to hypothesize that the P2X(7)R is scaffolded to caveolae in osteoblasts. Thus, upon activation of the P2X(7)R, we postulate that caveolae are endocytosed, thereby modulating the downstream signal. Sucrose gradient fractionation of MC3T3-E1 preosteoblasts showed that CAV1 was translocated to the denser cytosolic fractions upon stimulation with ATP. Both ATP and the more specific P2X(7)R agonist 2'(3')-O-(4-benzoylbenzoyl)ATP (BzATP) induced endocytosis of CAV1, which was inhibited when MC3T3-E1 cells were pretreated with the specific P2X7R antagonist A-839977. The P2X7R cofractionated with CAV1, but, using superresolution structured illumination microscopy, we found only a subpopulation of P2X(7)R in these lipid microdomains on the membrane of MC3T3-E1 cells. Suppression of CAV1 enhanced the intracellular Ca(2+) response to BzATP, suggesting that caveolae regulate P2X(7)R signaling. This proposed mechanism is supported by increased mineralization in CAV1 knockdown MC3T3-E1 cells treated with BzATP. These data suggest that caveolae regulate P2X(7)R signaling upon activation by undergoing endocytosis and potentially carrying with it other signaling proteins, hence controlling the spatiotemporal signaling of P2X(7)R in osteoblasts.

  2. Expression of the apoptotic calcium channel P2X7 in the glandular epithelium.

    PubMed

    Slater, Michael; Danieletto, Suzanne; Barden, Julian A

    2005-03-01

    In the current study, expression of the apoptotic calcium channel receptor P2X(7) and prostate-specific antigen (PSA) levels were studied in biopsy cores from 174 patients as well as 20 radical prostatectomy cases. In clinical biopsies, we have previously demonstrated that P2X(1 )and P2X(2) calcium channel receptors are absent from normal prostate epithelium that does not progress to prostate cancer within 5 years. In cases that did progress to prostate cancer however, P2X(1 )and P2X(2) labeling was observed in a stage-specific manner first in the nucleus, then the cytoplasm and finally on the apical epithelium, as prostate cancer developed. These markers were present up to 5 years before cancer was detectable by the usual morphological criteria (Gleason grading) as determined by H and E staining. In the current study, the apoptotic calcium channel receptor P2X(7) yielded similar results to that of P2X(1) and P2X(2). Using radical prostatectomy tissue sections as well as biopsies, these changes in calcium channel metabolism were noted throughout the prostate, indicating a field effect. This finding suggests that the presence of a prostate tumor could be detected without the need for direct sampling of tumor tissue, leading to detection of false negative cases missed by H or E stain. The reliability of PSA levels as a prognostic indicator has been questioned in recent years. In the current study, PSA levels were correlated with the P2X(7) labeling results. All patients who exhibited no P2X(7) labeling had a prostatic serum antigen (PSA) level of <2. Patients who exhibited stage-specific P2X(7) expression, and who later developed obvious prostate cancer as diagnosed by H and E stain, all had a PSA > 2. This finding suggests that increasing PSA may be an accurate indicator of cancer development.

  3. Involvement of the P2X7-NLRP3 axis in leukemic cell proliferation and death

    PubMed Central

    Salaro, Erica; Rambaldi, Alessia; Falzoni, Simonetta; Amoroso, Francesca Saveria; Franceschini, Alessia; Sarti, Alba Clara; Bonora, Massimo; Cavazzini, Francesco; Rigolin, Gian Matteo; Ciccone, Maria; Audrito, Valentina; Deaglio, Silvia; Pelegrin, Pablo; Pinton, Paolo; Cuneo, Antonio; Di Virgilio, Francesco

    2016-01-01

    Lymphocyte growth and differentiation are modulated by extracellular nucleotides and P2 receptors. We previously showed that the P2X7 receptor (P2X7R or P2RX7) is overexpressed in circulating lymphocytes from chronic lymphocytic leukemia (CLL) patients. In the present study we investigated the P2X7R/NLRP3 inflammasome axis in lymphocytes from a cohort of 23 CLL patients. P2X7R, ASC and NLRP3 were investigated by Western blot, PCR and transfection techniques. P2X7R was overexpressed and correlated with chromosome 12 trisomy in CLL patients. ASC mRNA and protein were also overexpressed. On the contrary, NLRP3 was dramatically down-modulated in CLL lymphocytes relative to lymphocytes from healthy donors. To further investigate the correlation between P2X7R, NLRP3 and cell growth, NLRP3 was silenced in THP-1 cells, a leukemic cell line that natively expresses both NLRP3 and P2X7R. NLRP3 silencing enhanced P2X7R expression and promoted growth. On the contrary, NLRP3 overexpression caused accelerated apoptosis. The P2X7R was also up-modulated in hematopoietic cells from NLRP3-KO mice. In conclusion, we show that NLRP3 down-modulation stimulates P2X7R expression and promotes growth, while NLRP3 overexpression inhibits cell proliferation and stimulates apoptosis. These findings suggest that NLRP3 is a negative regulator of growth and point to a role of the P2X7R/NLRP3 axis in CLL. PMID:27221966

  4. Effect of substitution of nitrogen ions to red-emitting Sr 3B 2O 6-3/2 xN x:Eu 2+ oxy-nitride phosphor for the application to white LED

    NASA Astrophysics Data System (ADS)

    Hoon Jung, Sang; Seok Kang, Dong; Young Jeon, Duk

    2011-07-01

    The luminescence properties of orange-red-emitting Eu 2+ activated Sr 3B 2O 6-3/2 xN x were optimized for application to blue/near UV light-emitting diodes (LEDs). Sr 3B 2O 6-3/2 xN x:Eu 2+ phosphor showed broad orange-red emission peaking at 600-650 nm under blue and n-UV excitations of 450 and 360 nm, respectively; the emission peak of phosphor was affected by nitrogen ion substitution. Boron nitride raw materials affect luminescence properties of phosphor; a small amount of BN reacts as a flux for synthesis of Sr 3B 2O 6 and a large amount of BN helps Sr 3B 2O 6-3/2 xN x:Eu 2+ phosphor to have longer-wavelength emission peak. A 447 nm-emitting blue LED-pumped white LED with a mixture of Sr 3B 2O 6-3/2 xN x:Eu 2+ ( x=1) and Ba 2SiO 4:Eu 2+ green-emitting phosphor was fabricated; it is observed that it showed color coordinates of (0.3648, 0.3605) and CRI value of 96.

  5. Network model with structured nodes

    NASA Astrophysics Data System (ADS)

    Frisco, Pierluigi

    2011-08-01

    We present a network model in which words over a specific alphabet, called structures, are associated to each node and undirected edges are added depending on some distance measure between different structures. This model shifts the underlying principle of network generation from a purely mathematical one to an information-based one. It is shown how this model differs from the Barábasi-Albert and duplication models and how it can generate networks with topological features similar to biological networks: power law degree distribution, low average path length, clustering coefficient independent from the network size, etc. Two biological networks: S. cerevisiae gene network and E. coli protein-protein interaction network, are replicated using this model.

  6. Human neutrophils do not express purinergic P2X7 receptors

    PubMed Central

    Martel-Gallegos, Guadalupe; Rosales-Saavedra, María T.; Reyes, Juan P.; Casas-Pruneda, Griselda; Toro-Castillo, Carmen; Pérez-Cornejo, Patricia

    2010-01-01

    It has been reported that in human neutrophils, external ATP activates plasma membrane purinergic P2X7 receptors (P2X7R) to elicit Ca2+ entry, production of reactive oxygen species (ROS), processing and release of pro-inflammatory cytokines, shedding of adhesion molecules and uptake of large molecules. However, the expression of P2X7R at the plasma membrane of neutrophils has also been questioned since these putative responses are not always reproduced. In this work, we used electrophysiological recordings to measure functional responses associated with the activation of membrane receptors, spectrofluorometric measurements of ROS production and ethidium bromide uptake to asses coupling of P2X7R activation to downstream effectors, immune-labelling of P2X7R using a fluorescein isothiocyanate-conjugated antibody to detect the receptors at the plasma membrane, RT-PCR to determine mRNA expression of P2X7R and Western blot to determine protein expression in neutrophils and HL-60 cells. None of these assays reported the presence of P2X7R in the plasma membrane of neutrophils and non-differentiated or differentiated HL-60 cells—a model cell for human neutrophils. We concluded that P2X7R are not present at plasma membrane of human neutrophils and that the putative physiological responses triggered by external ATP should be reconsidered. PMID:21103213

  7. Nociceptive transmission and modulation via P2X receptors in central pain syndrome.

    PubMed

    Kuan, Yung-Hui; Shyu, Bai-Chuang

    2016-05-26

    Painful sensations are some of the most frequent complaints of patients who are admitted to local medical clinics. Persistent pain varies according to its causes, often resulting from local tissue damage or inflammation. Central somatosensory pathway lesions that are not adequately relieved can consequently cause central pain syndrome or central neuropathic pain. Research on the molecular mechanisms that underlie this pathogenesis is important for treating such pain. To date, evidence suggests the involvement of ion channels, including adenosine triphosphate (ATP)-gated cation channel P2X receptors, in central nervous system pain transmission and persistent modulation upon and following the occurrence of neuropathic pain. Several P2X receptor subtypes, including P2X2, P2X3, P2X4, and P2X7, have been shown to play diverse roles in the pathogenesis of central pain including the mediation of fast transmission in the peripheral nervous system and modulation of neuronal activity in the central nervous system. This review article highlights the role of the P2X family of ATP receptors in the pathogenesis of central neuropathic pain and pain transmission. We discuss basic research that may be translated to clinical application, suggesting that P2X receptors may be treatment targets for central pain syndrome.

  8. Nodes packaging option for Space Station application

    NASA Technical Reports Server (NTRS)

    So, Kenneth T.; Hall, John B., Jr.

    1988-01-01

    Space Station nodes packaging analyses are presented relative to moving environmental control and life support system (ECLSS) equipment from the habitability (HAB) module to node 4, in order to provide more living space and privacy for the crew, remove inherently noisy equipment from the crew quarter, retain crew waste collection and processing equipment in one location, and keep objectionable odor away from the living quarters. In addition, options for moving external electronic equipment from the Space Station truss to pressurized node 3 were evaluated in order to reduce the crew extravehicular-activity time required to install and maintain the equipment. Node size considered in this analysis is 3.66 m in diameter and 5.38 m long. The analysis shows that significant external electronic equipment could be relocated from the Space Station truss structure to node 3, and nonlife critical ECLSS HAB module equipment could be moved to node 4.

  9. Sentinel lymph node biopsy reveals a positive popliteal node in clear cell sarcoma.

    PubMed

    Nishida, Yoshihiro; Yamada, Yoshihisa; Tsukushi, Satoshi; Shibata, Shinichi; Ishiguro, Naoki

    2005-01-01

    Clear cell sarcoma of the tendons and aponeuroses is an aggressive, rare soft tissue tumor with frequent metastases to regional lymph nodes. Sentinel lymph node biopsy, which has dramatically changed the management of melanoma, was used for clear cell sarcoma for an evaluation of popliteal and groin lymph node status. Although all isosulfan blue-stained groin lymph nodes were negative for malignancy, a popliteal lymph node was positive. Adjuvant 50 Gy of radiotherapy to the popliteal node might have been effective for local control for one year.

  10. Apolipoprotein A-I Q[-2]X causing isolated apolipoprotein A-I deficiency in a family with analphalipoproteinemia.

    PubMed Central

    Ng, D S; Leiter, L A; Vezina, C; Connelly, P W; Hegele, R A

    1994-01-01

    We report a Canadian kindred with a novel mutation in the apolipoprotein (apo) A-I gene causing analphalipoproteinemia. The 34-yr-old proband, product of a consanguineous marriage, had bilateral retinopathy, bilateral cataracts, spinocerebellar ataxia, and tendon xanthomata. High density lipoprotein cholesterol (HDL-C) was < 0.1 mM and apoA-I was undetectable. Genomic DNA sequencing of the proband's apoA-I gene identified a nonsense mutation at codon [-2], which we designate as Q[-2]X. This mutation causes a loss of endonuclease digestion sites for both BbvI and Fnu4HI. Genotyping identified four additional homozygotes, four heterozygotes, and two unaffected subjects among the first-degree relatives. Q[-2]X homozygosity causes a selective failure to produce any portion of mature apoA-I, resulting in very low plasma level of HDL. Heterozygosity results in approximately half-normal apoA-I and HDL. Gradient gel electrophoresis and differential electroimmunodiffusion assay revealed that the HDL particles of the homozygotes had peak Stokes diameter of 7.9 nm and contained apoA-II without apoA-I (Lp-AII). Heterozygotes had an additional fraction of HDL3-like particles. Two of the proband's affected sisters had documented premature coronary heart disease. This kindred, the third reported apoA-I gene mutation causing isolated complete apoA-I deficiency, appears to be at significantly increased risk for atherosclerosis. Images PMID:8282791

  11. Flower-like morphology of blue and greenish-gray ZnCoxAl2-xO4 nanopigments

    NASA Astrophysics Data System (ADS)

    Wahba, Adel Maher; Imam, N. G.; Mohamed, Mohamed Bakr

    2016-02-01

    In the present work, ZnCoxAl2 - xO4 (x = 0.00-1.50) nanosized pigments were synthesized for the first time by citrate-precursor autocombustion method and heat treatment at 900 °C. In this new nanopigment system the vacancies participate in the spinel structure since the divalent cobalt ions substitute the trivalent Al ions. Structural, microstructural and optical properties were investigated using XRD, FTIR, TEM, HRSEM, XRF, and PL techniques. XRD and FTIR spectra proved the formation of a pure cubic spinel phase. Size of the synthesized nano-crystals ranges from 15 to 60 nm, which is further confirmed with TEM micrographs. HRSEM confirms the microporous nature with flower-like morphology of the prepared nanopigments. Cation distribution has been suggested for the whole samples that matches quite well with XRD and IR experimental data. PL results show that the ZnCoxAl2 - xO4 pigments have good potential for use as a yellow-orange phosphor for displays and/or white light-emitting diodes.

  12. Drainage of cells and soluble antigen from the CNS to regional lymph nodes.

    PubMed

    Laman, Jon D; Weller, Roy O

    2013-09-01

    Despite the absence of conventional lymphatics, there is efficient drainage of both cerebrospinal fluid (CSF) and interstitial fluid (ISF) from the CNS to regional lymph nodes. CSF drains from the subarachnoid space by channels that pass through the cribriform plate of the ethmoid bone to the nasal mucosa and cervical lymph nodes in animals and in humans; antigen presenting cells (APC) migrate along this pathway to lymph nodes. ISF and solutes drain from the brain parenchyma to cervical lymph nodes by a separate route along 100-150 nm wide basement membranes in the walls of cerebral capillaries and arteries. This pathway is too narrow for the migration of APC so it is unlikely that APC traffic directly from brain parenchyma to lymph nodes by this route. We present a model for the pivotal involvement of regional lymph nodes in immunological reactions of the CNS. The role of regional lymph nodes in immune reactions of the CNS in virus infections, the remote influence of the gut microbiota, multiple sclerosis and stroke are discussed. Evidence is presented for the role of cervical lymph nodes in the induction of tolerance and its influence on neuroimmunological reactions. We look to the future by examining how nanoparticle technology will enhance our understanding of CNS-lymph node connections and by reviewing the implications of lymphatic drainage of the brain for diagnosis and therapy of diseases of the CNS ranging from neuroimmunological disorders to dementias. Finally, we review the challenges and opportunities for progress in CNS-lymph node interactions and their involvement in disease processes.

  13. Nb doping effect on TiO2-x films for bolometer applications

    NASA Astrophysics Data System (ADS)

    Shin, Young Bong; Kumar Reddy, Y. Ashok; Kang, In-Ku; Lee, Hee Chul

    2016-04-01

    Nb-doped TiO2-x thin films were deposited using a 1 at% niobium doped titanium target by RF reactive magnetron sputtering at various oxygen partial pressures (pO2). The films appeared amorphous in the pO2 range of 4.4-4.7% with resistivity ranging from 0.39 Ω cm to 2.48 Ω cm. Compared to pure TiO2-x films, the resistivity of the Nb-doped TiO2-x films did not change sensitively with the oxygen partial pressure, indicating that the resistivity of the films can be accurately controlled. 1/f noise parameter of Nb-doped TiO2-x films were found to decrease largely while the measured temperature coefficient of resistance (TCR) of the films was still high. The obtained results indicate that Nb-doped TiO2-x films have great potential as an alternative bolometric material.

  14. Imaging of head and neck lymph nodes.

    PubMed

    Eisenmenger, Laura B; Wiggins, Richard H

    2015-01-01

    The cervical lymph nodes can be affected by a variety of infectious, inflammatory, benign, and malignant pathologic conditions. Clinical history and physical examination with the complementary use of imaging is essential to accurately make a diagnosis or appropriate differential. Knowledge of cervical lymph node anatomy, drainage pathways, morphologic variations, and common nodal pathology is key to correct interpretation of cervical lymph nodes on imaging. Computed tomography (CT), MR, ultrasound, and PET/CT are complementary imaging modalities that can be used in the evaluation of cervical lymph node pathology.

  15. P2X receptors as targets for the treatment of status epilepticus

    PubMed Central

    Henshall, David C.; Diaz-Hernandez, Miguel; Miras-Portugal, M. Teresa; Engel, Tobias

    2013-01-01

    Prolonged seizures are amongst the most common neurological emergencies. Status epilepticus is a state of continuous seizures that is life-threatening and prompt termination of status epilepticus is critical to protect the brain from permanent damage. Frontline treatment comprises parenteral administration of anticonvulsants such as lorazepam that facilitate γ-amino butyric acid (GABA) transmission. Because status epilepticus can become refractory to anticonvulsants in a significant proportion of patients, drugs which act on different neurotransmitter systems may represent potential adjunctive treatments. P2X receptors are a class of ligand-gated ion channel activated by ATP that contributes to neuro- and glio-transmission. P2X receptors are expressed by both neurons and glia in various brain regions, including the hippocampus. Electrophysiology, pharmacology and genetic studies suggest certain P2X receptors are activated during pathologic brain activity. Expression of several members of the family including P2X2, P2X4, and P2X7 receptors has been reported to be altered in the hippocampus following status epilepticus. Recent studies have shown that ligands of the P2X7 receptor can have potent effects on seizure severity during status epilepticus and mice lacking this receptor display altered seizures in response to chemoconvulsants. Antagonists of the P2X7 receptor also modulate neuronal death, microglial responses and neuroinflammatory signaling. Recent work also found altered neuronal injury and inflammation after status epilepticus in mice lacking the P2X4 receptor. In summary, members of the P2X receptor family may serve important roles in the pathophysiology of status epilepticus and represent novel targets for seizure control and neuroprotection. PMID:24324404

  16. Immunohistochemical identification of cells expressing ATP-gated cation channels (P2X receptors) in the adult rat thyroid

    PubMed Central

    GLASS, RAINER; BURNSTOCK, GEOFFREY

    2001-01-01

    We carried out immunohistochemistry and western blotting of fresh frozen sections and crude extracts from adult rat thyroids. The histochemical and immunoblotting studies were performed with P2X receptor antibodies from 2 different sources. P2X-immunopositive cells were identified by fluorescence double labelling and confocal microscopy. Results of the western blotting experiments showed double bands of approximately 70 kDa and 140 kDa for all 7 P2X receptor subtypes with both sets of antibodies. Histochemical stains with antibodies from both sources also gave essentially identical results. P2X1, P2X2 and P2X6 receptors were detected exclusively in vascular smooth muscle; P2X5 and P2X7 receptors were also present on vascular smooth muscle. Endothelial cells stained for P2X3, P2X4 and P2X7 receptors. Thyroid follicular cells displayed immunoreactivity for P2X3, P2X4 and P2X5 receptors. No immunostaining for P2X receptors was observed on C-cells. Possible roles for the broad expression of P2X receptor subtypes in the rat thyroid are discussed. PMID:11430696

  17. Spin-stripe density varies linearly with the hole content in single-layer Bi2+xSr2-xCuO6+y cuprate superconductors.

    PubMed

    Enoki, M; Fujita, M; Nishizaki, T; Iikubo, S; Singh, D K; Chang, S; Tranquada, J M; Yamada, K

    2013-01-04

    We have performed inelastic neutron scattering measurements on the single-layer cuprate Bi(2+x) Sr(2-x) CuO(6+y) (Bi2201) with x = 0.2, 0.3, 0.4, and 0.5, a doping range that spans the spin-glass to superconducting phase boundary. The doping evolution of low energy spin fluctuations (11 2-x) Sr(x)CuO(4) are discussed.

  18. Spin-Stripe Density Varies Linearly With the Hole Content in Single-Layer Bi2+xSr2-xCuO6+y Cuprate Superconductors

    NASA Astrophysics Data System (ADS)

    Enoki, M.; Fujita, M.; Nishizaki, T.; Iikubo, S.; Singh, D. K.; Chang, S.; Tranquada, J. M.; Yamada, K.

    2013-01-01

    We have performed inelastic neutron scattering measurements on the single-layer cuprate Bi2+xSr2-xCuO6+y (Bi2201) with x=0.2, 0.3, 0.4, and 0.5, a doping range that spans the spin-glass to superconducting phase boundary. The doping evolution of low energy spin fluctuations (≲11meV) was found to be characterized by a change in the incommensurate modulation wave vector from the tetragonal [110] to [100]/[010] directions, while maintaining a linear relation between the incommensurability and the hole concentration, δ≈p. In the superconducting regime, the spectral weight is strongly suppressed below ˜4meV. Similarities and differences in the spin correlations between Bi2201 and the prototypical single-layer system La2-xSrxCuO4 are discussed.

  19. Modulation of bladder afferent signals in normal and spinal cord-injured rats by purinergic P2X3 and P2X2/3 receptors

    PubMed Central

    Munoz, Alvaro; Somogyi, George T.; Boone, Timothy B.; Ford, Anthony P.; Smith, Christopher P.

    2015-01-01

    OBJECTIVE • To evaluate the role of bladder sensory purinergic P2X3 and P2X2/3 receptors on modulating the activity of lumbosacral neurones and urinary bladder contractions in vivo in normal or spinal cord-injured (SCI) rats with neurogenic bladder overactivity. MATERIALS AND METHODS • SCI was induced in female rats by complete transection at T8 – T9 and experiments were performed 4 weeks later, when bladder overactivity developed. Non-transected rats were used as controls (normal rats). • Neural activity was recorded in the dorsal horn of the spinal cord and field potentials were acquired in response to intravesical pressure steps via a suprapubic catheter. Field potentials were recorded under control conditions, after stimulation of bladder mucosal purinergic receptors with intravesical ATP (1 mm), and after intravenous injection of the P2X3/P2X2/3 antagonist AF-353 (10 mg/kg and 20 mg/kg). • Cystometry was performed in urethaneanaesthetised rats intravesically infused with saline. AF-353 (10 mg/kg) was systemically applied after baseline recordings; the rats also received a second dose of AF-353 (20 mg/kg). Changes in the frequency of voiding (VC) and non-voiding (NVC) contractions were evaluated. RESULTS • SCI rats had significantly higher frequencies for field potentials and NVC than NL rats. Intravesical ATP increased field potential frequency in control but not SCI rats, while systemic AF-353 significantly reduced this parameter in both groups. • AF-353 also reduced the inter-contractile interval in control but not in SCI rats; however, the frequency of NVC in SCI rats was significantly reduced. CONCLUSION • The P2X3/P2X2/3 receptors on bladder afferent nerves positively regulate sensory activity and NVCs in overactive bladders. PMID:22540742

  20. [Effect of Zhuangyao Jianshen Wan (ZYJCW) on P2X1 and P2X3 mRNA expressions in rats with diuresis caused by kidney deficiency].

    PubMed

    Chen, Jia-yi; Jiang, Wei-wen; He, Feng-lei; Mo, Guo-qiang; Guo, Zhong-hui; Wang, Xiao-dan; Wu, Qing-he; Cao, Hong-yin

    2015-08-01

    To investigate the urination-reducing effect and mechanism of Zhuangyao Jianshen Wan (ZYJCW). In this study, SI rats were subcutaneously injected with 150 mg · kg(-1) dose of D-galactose to prepare the sub-acute aging model and randomly divided into the model group, the Suoquan Wan group (1.17 g · kg(-1) · d(-1)), and ZYJCW high, medium and low dose groups (2.39, 1.20, 0.60 g · kg(-1) · d(-1)) , with normal rats in the blank group. They were continuously administered with drugs for eight weeks. The metabolic cage method was adopted to measure the 24 h urine volume and 5 h water load urine volume in rats. The automatic biochemistry analyzer was adopted to detect urine concentrations of Na+, Cl-, K+. The ELISA method was used to determine serum aldosterone (ALD) and antidiuretic hormone (ADH). The changes in P2X1 and P2X3 mRNA expressions in bladder tissues of rats were detected by RT-PCR. According to the results, both ZYJCW high and medium dose groups showed significant down-regulations in 24 h urine volume and 5 h water load urine volume in (P <0.05, P <0.01), declines in Na+ and Cl- concentrations in urine (P <0.01), notable rises in plasma ALD and ADH contents (P <0.05, P <0.01) and remarkable down-regulations in the P2X1 and P2X3 mRNA expressions in bladder tissues (P <0.01). The ZYJCW low dose group revealed obvious reductions in Na+ and Cl- concentrations in urine (P <0.01). The results indicated that ZYJCW may show the urination-reducing effect by down-regulating the P2X1 and P2X3 mRNA expressions in bladder tissues of rats with diuresis caused by kidney deficiency.

  1. A facile synthesis of versatile Cu2-xS nanoprobe for enhanced MRI and infrared thermal/photoacoustic multimodal imaging.

    PubMed

    Mou, Juan; Liu, Chengbo; Li, Pei; Chen, Yu; Xu, Huixiong; Wei, Chenyang; Song, Liang; Shi, Jianlin; Chen, Hangrong

    2015-07-01

    A novel type of intelligent nanoprobe by using single component of Cu2-xS for multimodal imaging has been facilely and rapidly synthesized in scale via thermal decomposition followed by biomimetic phospholipid modification, which endows them with uniform and small nanoparticle size (ca.15 nm), well phosphate buffer saline (PBS) dispersity, high stability, and excellent biocompatibility. The as-synthesized Cu2-xS nanoprobes (Cu2-xS NPs) are capable of providing contrast enhancement for T1-weighted magnetic resonance imaging (MRI), as demonstrated by the both in vitro and in vivo imaging investigations for the first time. In addition, due to their strong near infrared (NIR) optical absorption, they can also serve as a candidate contrast agent for enhanced infrared thermal/photoacoustic imaging, to meet the shortfalls of MRI. Hence, complementary and potentially more comprehensive information can be acquired for the early detection and accurate diagnosis of cancer. Furthermore, negligible systematic side effects to the blood and tissue were observed in a relatively long period of 3 months. The distinctive multimodal imaging capability with excellent hemo/histocompatibility of the Cu2-xS NPs could open up a new molecular imaging possibility for detecting and diagnosing cancer or other diseases in the future.

  2. Luminescence properties of a novel promising red phosphor Na3Gd2-x(BO3)3:xEu3+

    NASA Astrophysics Data System (ADS)

    Wei, Tengyue; Ren, Qiang; Wu, Xiulan; Shi, Xiaolei; Wang, Baoxing; Huo, Zhezhe

    2016-11-01

    The novel red-emitting Na3Gd2-x(BO3)3:xEu3+ phosphors were synthesized by a solid-state method. Under near ultraviolet excitation, the phosphors exhibit dominant emission peak at 614 nm and generate bright red light, which is attributed to the electric-dipole transition 5D0→7F2. The optimal doping amount of Eu3+ in Na3Gd2-x(BO3)3:xEu3+ phosphors is x=0.3 for the maximum emission. The exchange interaction between Eu3+ ions is identified to be the main mechanism in the concentration quenching process. The CIE color coordinates of the Na3Gd2-x(BO3)3:xEu3+ phosphors (x=0.650, y=0.350) are close to the NTSC standard values of red. With a relatively high quantum efficiency of 35.2%, Na3Gd2-x(BO3)3:xEu3+ red-emitting phosphor is probably a promising candidate for near ultraviolet-based white LEDs application.

  3. Self-assembly of [UO2X4]2- (X=Cl, Br) dianions with γ substituted pyridinium cations: Structural systematics and fluorescence properties

    NASA Astrophysics Data System (ADS)

    Surbella, Robert G.; Andrews, Michael B.; Cahill, Christopher L.

    2016-04-01

    Room temperature self-assembly of [UO2X4]2- (X=Cl, Br) with γ substituted pyridinium cations has resulted in the formation of twelve compounds that were studied via single crystal X-ray diffraction and fluorescence spectroscopy. Systematic variation of electron donating groups on the pyridinium species is shown to influence the presence and/or strength of various supramolecular synthons, including hydrogen bonding and pi interactions. Combinations of such non-covalent interactions (NCIs) have given rise to a range of supramolecular assemblies, and are shown to influence uranyl emission by way of second sphere coordination to equatorial ligands.

  4. Photochromic and self-cleaning properties of TiO2-AgCl/TiO2-xCu thin film.

    PubMed

    Sangchay, Weerachai; Sikong, Lek; Kooptarnond, Kalayanee

    2013-02-01

    The TiO2-AgCl/TiO2-xCu thin films were prepared by sol-gel method and dip coated on glass slide. The prepared films were synthesized at the temperature of 400 degrees C for 2 h with a heating rate of 10 degrees C/min. The microstructure and properties of synthesized TiO2-AgCl/TiO2-xCu thin films were characterized by X-ray diffraction, scanning electron microscopy, atomic forced microscope and UV-vis diffuse reflectance spectroscopy. Finally, the hydrophilic property was evaluated by means of contact angle of water droplet on the films. The results show all samples have film thickness in range of 400-500 nm and their surfaces are dense and strong with a large surface area according to the image of atomic forced microscope. It can be noted that TiO2-AgCl/TiO2-5Cu thin films exhibit the highest photochromic (or the lowest capability of light transmittance) at 250-400 nm. The TiO2-AgCl/TiO2-xCu thin films can block UV C, UV B and UV A rays and exhibit self-cleaning effect (small contact angle, 3.9 degrees ) under UV irradiation.

  5. Composition and Interface Engineering of Alloyed MoS2 x Se2(1- x ) Nanotubes for Enhanced Hydrogen Evolution Reaction Activity.

    PubMed

    Zhang, Junjun; Wu, Mei-Hui; Shi, Zheng-Tian; Jiang, Miao; Jian, Wen-Jing; Xiao, Zhangru; Li, Jixue; Lee, Chun-Sing; Xu, Jun

    2016-08-01

    Hierarchical MoS2 x Se2(1- x ) nanotubes assembled from several-layered nanosheets featuring tunable chalcogen compositions, expanded interlayer spacing and carbon modification, are synthesized for enhanced electrocatalytic hydrogen evolution reaction (HER). The chalcogen compositions of the MoS2 x Se2(1- x ) nanotubes are controllable by adjusting the selenization temperature and duration while the expanded (002) interlayer spacing varies from 0.98 to 0.68 nm. It is found that the MoS2 x Se2(1- x ) (x = 0.54) nanotubes with expanded interlayer spacing of 0.98 nm exhibit the highest electrocatalytic HER activity with a low onset potential of 101 mV and a Tafel slope of 55 mV dec(-1) . The improved electrocatalytic performance is attributed to the chalcogen composition tuning and the interlayer distance expansion to achieve benefitting hydrogen adsorption energy. The present work suggests a potential way to design advanced HER electrocatalysts through modulating their compositions and interlayer distances.

  6. EUV actinic defect inspection and defect printability at the sub-32 nm half pitch

    SciTech Connect

    Huh, Sungmin; Kearney, Patrick; Wurm, Stefan; Goodwin, Frank; Han, Hakseung; Goldberg, Kenneth; Mochi, Iacopp; Gullikson, Eric M.

    2009-08-01

    Extreme ultraviolet (EUV) mask blanks with embedded phase defects were inspected with a reticle actinic inspection tool (AIT) and the Lasertec M7360. The Lasertec M7360, operated at SEMA TECH's Mask Blank Development Center (MBDC) in Albany, NY, has a sensitivity to multilayer defects down to 40-45 nm, which is not likely sufficient for mask blank development below the 32 nm half-pitch node. Phase defect printability was simulated to calculate the required defect sensitivity for a next generation blank inspection tool to support reticle development for the sub-32 nm half-pitch technology node. Defect mitigation technology is proposed to take advantage of mask blanks with some defects. This technology will reduce the cost of ownership of EUV mask blanks. This paper will also discuss the kind of infrastructure that will be required for the development and mass production stages.

  7. The impact of axillary lymph nodes removed in staging of node-positive breast carcinoma

    SciTech Connect

    Kuru, Bekir . E-mail: bekirkuru@hotmail.com; Bozgul, Mustafa

    2006-12-01

    Purpose: Number of positive lymph nodes in the axilla and pathologic lymph node status (pN) have a great impact on staging according to the current American Joint Committee on Cancer staging system of breast carcinoma. Our aim was to define whether the total number of removed axillary lymph nodes influences the pN and thus the staging. Methods and Materials: The records of 798 consecutive invasive breast cancer patients with T1-3 tumors and positive axillary lymph nodes who underwent modified radical mastectomy between 1999 and 2005 in our hospital were reviewed. The total number of removed nodes were grouped, and compared with the patient and tumor characteristics and the influence of the number of nodes removed on the staging was analyzed. Results: The proportion of patients with {>=}4 positive nodes (59%), and pN3 status (51%) were the highest in the group with 21-25 nodes removed. Compared with patients with 1-20 nodes removed, the proportion of patients with {>=}4 positive nodes (52%), and pN3 status (46%) were significantly higher in those with more than 20 nodes removed. Although the proportion of Stage IIA and IIB decreased, the proportion of Stage IIIA and IIIC increased in patients with >20 nodes removed compared with those with 1-20 nodes removed. Conclusions: In patients with axillary node-positive breast carcinoma, staging is highly influenced by total number of removed nodes. Levels I-III axillary dissection with more than 20 axillary lymph nodes removed could lead to more effective adjuvant chemotherapy and increases substantially the proportion of patients to receive radiotherapy.

  8. Involvement of P2X7 receptor in neuronal degeneration triggered by traumatic injury

    PubMed Central

    Nadal-Nicolás, Francisco M.; Galindo-Romero, Caridad; Valiente-Soriano, Francisco J.; Barberà-Cremades, María; deTorre-Minguela, Carlos; Salinas-Navarro, Manuel; Pelegrín, Pablo; Agudo-Barriuso, Marta

    2016-01-01

    Axonal injury is a common feature of central nervous system insults that culminates with the death of the affected neurons, and an irreversible loss of function. Inflammation is an important component of the neurodegenerative process, where the microglia plays an important role by releasing proinflammatory factors as well as clearing the death neurons by phagocytosis. Here we have identified the purinergic signaling through the P2X7 receptor as an important component for the neuronal death in a model of optic nerve axotomy. We have found that in P2X7 receptor deficient mice there is a delayed loss of retinal ganglion cells and a decrease of phagocytic microglia at early times points after axotomy. In contralateral to the axotomy retinas, P2X7 receptor controlled the numbers of phagocytic microglia, suggesting that extracellular ATP could act as a danger signal activating the P2X7 receptor in mediating the loss of neurons in contralateral retinas. Finally, we show that intravitreal administration of the selective P2X7 receptor antagonist A438079 also delays axotomy-induced retinal ganglion cell death in retinas from wild type mice. Thus, our work demonstrates that P2X7 receptor signaling is involved in neuronal cell death after axonal injury, being P2X7 receptor antagonism a potential therapeutic strategy. PMID:27929040

  9. Blockade of P2X7 receptors or pannexin-1 channels similarly attenuates postischemic damage

    PubMed Central

    Cisneros-Mejorado, Abraham; Gottlieb, Miroslav; Cavaliere, Fabio; Magnus, Tim; Koch-Nolte, Friederich; Scemes, Eliana; Pérez-Samartín, Alberto; Matute, Carlos

    2015-01-01

    The role of P2X7 receptors and pannexin-1 channels in ischemic damage remains controversial. Here, we analyzed their contribution to postanoxic depolarization after ischemia in cultured neurons and in brain slices. We observed that pharmacological blockade of P2X7 receptors or pannexin-1 channels delayed the onset of postanoxic currents and reduced their slope, and that simultaneous inhibition did not further enhance the effects of blocking either one. These results were confirmed in acute cortical slices from P2X7 and pannexin-1 knockout mice. Oxygen-glucose deprivation in cortical organotypic cultures caused neuronal death that was reduced with P2X7 and pannexin-1 blockers as well as in organotypic cultures derived from mice lacking P2X7 and pannexin 1. Subsequently, we used transient middle cerebral artery occlusion to monitor the neuroprotective effect of those drugs in vivo. We found that P2X7 and pannexin-1 antagonists, and their ablation in knockout mice, substantially attenuated the motor symptoms and reduced the infarct volume to ~50% of that in vehicle-treated or wild-type animals. These results show that P2X7 receptors and pannexin-1 channels are major mediators of postanoxic depolarization in neurons and of brain damage after ischemia, and that they operate in the same deleterious signaling cascade leading to neuronal and tissue demise. PMID:25605289

  10. Blockade of P2X7 receptors or pannexin-1 channels similarly attenuates postischemic damage.

    PubMed

    Cisneros-Mejorado, Abraham; Gottlieb, Miroslav; Cavaliere, Fabio; Magnus, Tim; Koch-Nolte, Friederich; Scemes, Eliana; Pérez-Samartín, Alberto; Matute, Carlos

    2015-05-01

    The role of P2X7 receptors and pannexin-1 channels in ischemic damage remains controversial. Here, we analyzed their contribution to postanoxic depolarization after ischemia in cultured neurons and in brain slices. We observed that pharmacological blockade of P2X7 receptors or pannexin-1 channels delayed the onset of postanoxic currents and reduced their slope, and that simultaneous inhibition did not further enhance the effects of blocking either one. These results were confirmed in acute cortical slices from P2X7 and pannexin-1 knockout mice. Oxygen-glucose deprivation in cortical organotypic cultures caused neuronal death that was reduced with P2X7 and pannexin-1 blockers as well as in organotypic cultures derived from mice lacking P2X7 and pannexin 1. Subsequently, we used transient middle cerebral artery occlusion to monitor the neuroprotective effect of those drugs in vivo. We found that P2X7 and pannexin-1 antagonists, and their ablation in knockout mice, substantially attenuated the motor symptoms and reduced the infarct volume to ~50% of that in vehicle-treated or wild-type animals. These results show that P2X7 receptors and pannexin-1 channels are major mediators of postanoxic depolarization in neurons and of brain damage after ischemia, and that they operate in the same deleterious signaling cascade leading to neuronal and tissue demise.

  11. P2X7 receptors trigger ATP exocytosis and modify secretory vesicle dynamics in neuroblastoma cells.

    PubMed

    Gutiérrez-Martín, Yolanda; Bustillo, Diego; Gómez-Villafuertes, Rosa; Sánchez-Nogueiro, Jesús; Torregrosa-Hetland, Cristina; Binz, Thomas; Gutiérrez, Luis Miguel; Miras-Portugal, María Teresa; Artalejo, Antonio R

    2011-04-01

    Previously, we reported that purinergic ionotropic P2X7 receptors negatively regulate neurite formation in Neuro-2a (N2a) mouse neuroblastoma cells through a Ca(2+)/calmodulin-dependent kinase II-related mechanism. In the present study we used this cell line to investigate a parallel though faster P2X7 receptor-mediated signaling pathway, namely Ca(2+)-regulated exocytosis. Selective activation of P2X7 receptors evoked exocytosis as assayed by high resolution membrane capacitance measurements. Using dual-wavelength total internal reflection microscopy, we have observed both the increase in near-membrane Ca(2+) concentration and the exocytosis of fluorescently labeled vesicles in response to P2X7 receptor stimulation. Moreover, activation of P2X7 receptors also affects vesicle motion in the vertical and horizontal directions, thus, involving this receptor type in the control of early steps (docking and priming) of the secretory pathway. Immunocytochemical and RT-PCR experiments evidenced that N2a cells express the three neuronal SNAREs as well as vesicular nucleotide and monoamine (VMAT-1 and VMAT-2) transporters. Biochemical measurements indicated that ionomycin induced a significant release of ATP from N2a cells. Finally, P2X7 receptor stimulation and ionomycin increased the incidence of small transient inward currents, reminiscent of postsynaptic quantal events observed at synapses. Small transient inward currents were dependent on extracellular Ca(2+) and were abolished by Brilliant Blue G, suggesting they were mediated by P2X7 receptors. Altogether, these results suggest the existence of a positive feedback mechanism mediated by P2X7 receptor-stimulated exocytotic release of ATP that would act on P2X7 receptors on the same or neighbor cells to further stimulate its own release and negatively control N2a cell differentiation.

  12. P2X7 Receptors Trigger ATP Exocytosis and Modify Secretory Vesicle Dynamics in Neuroblastoma Cells*

    PubMed Central

    Gutiérrez-Martín, Yolanda; Bustillo, Diego; Gómez-Villafuertes, Rosa; Sánchez-Nogueiro, Jesús; Torregrosa-Hetland, Cristina; Binz, Thomas; Gutiérrez, Luis Miguel; Miras-Portugal, María Teresa; Artalejo, Antonio R.

    2011-01-01

    Previously, we reported that purinergic ionotropic P2X7 receptors negatively regulate neurite formation in Neuro-2a (N2a) mouse neuroblastoma cells through a Ca2+/calmodulin-dependent kinase II-related mechanism. In the present study we used this cell line to investigate a parallel though faster P2X7 receptor-mediated signaling pathway, namely Ca2+-regulated exocytosis. Selective activation of P2X7 receptors evoked exocytosis as assayed by high resolution membrane capacitance measurements. Using dual-wavelength total internal reflection microscopy, we have observed both the increase in near-membrane Ca2+ concentration and the exocytosis of fluorescently labeled vesicles in response to P2X7 receptor stimulation. Moreover, activation of P2X7 receptors also affects vesicle motion in the vertical and horizontal directions, thus, involving this receptor type in the control of early steps (docking and priming) of the secretory pathway. Immunocytochemical and RT-PCR experiments evidenced that N2a cells express the three neuronal SNAREs as well as vesicular nucleotide and monoamine (VMAT-1 and VMAT-2) transporters. Biochemical measurements indicated that ionomycin induced a significant release of ATP from N2a cells. Finally, P2X7 receptor stimulation and ionomycin increased the incidence of small transient inward currents, reminiscent of postsynaptic quantal events observed at synapses. Small transient inward currents were dependent on extracellular Ca2+ and were abolished by Brilliant Blue G, suggesting they were mediated by P2X7 receptors. Altogether, these results suggest the existence of a positive feedback mechanism mediated by P2X7 receptor-stimulated exocytotic release of ATP that would act on P2X7 receptors on the same or neighbor cells to further stimulate its own release and negatively control N2a cell differentiation. PMID:21292765

  13. Salvage Lymph Node Dissection for Node-only Recurrence of Prostate Cancer: Ready for Prime Time?

    PubMed

    Suardi, Nazareno; Briganti, Alberto; Gandaglia, Giorgio; Fossati, Nicola; Montorsi, Francesco

    2016-12-30

    Several studies show that salvage lymph-node dissection for node-only recurrence of prostate cancer after radical treatment might represent a viable treatment modality for node-only recurrent PCa. However, as long as high quality data is not available, this approach should still be considered experimental.

  14. A multiple node software development environment

    SciTech Connect

    Heinicke, P.; Nicinski, T.; Constanta-Fanourakis, P.; Petravick, D.; Pordes, R.; Ritchie, D.; White, V.

    1987-06-01

    Experimenters on over 30 DECnet nodes at Fermilab use software developed, distributed, and maintained by the Data Acquisition Software Group. A general methodology and set of tools have been developed to distribute, use and manage the software on different sites. The methodology and tools are of interest to any group developing and using software on multiple nodes.

  15. Mediastinal lymph node size in lung cancer

    SciTech Connect

    Libshitz, H.I.; McKenna, R.J. Jr.

    1984-10-01

    Using a size criterion of 1 cm or greater as evidence for abnormality, the size of mediastinal lymph nodes identified by computed tomography (CT) was a poor predictor of mediastinal lymph node metastases in a series of 86 patients who had surgery for bronchogenic carcinoma. The surgery included full nodal sampling in all patients. Of the 86 patients, 36 had nodes greater than or equal to 1 cm identified by CT. Of the 21 patients with mediastinal metastases proven at surgery, 14 had nodes greater than or equal to 1 cm (sensitivity = 67%). Of the 65 patients without mediastinal metastases, 22 had nodes greater than or equal to 1 cm. Obstructive pneumonia and/or pulmonary collapse distal to the cancer was present in 39 patients (45%). Obstructive pneumonia and/or pulmonary collapse is a common occurrence in bronchogenic carcinoma, but mediastinal nodes greater than or equal to 1 cm in this circumstance cannot be presumed to represent metastatic disease. Metastatic mediastinal lymph node involvement was related to nodal size also in patients with evidence of prior granulomatous disease and in patients with no putative benign cause for nodes greater than or equal to 1 cm.

  16. System Engineering and Technical Challenges Overcome in the J-2X Rocket Engine Development Project

    NASA Technical Reports Server (NTRS)

    Ballard, Richard O.

    2012-01-01

    Beginning in 2006, NASA initiated the J-2X engine development effort to develop an upper stage propulsion system to enable the achievement of the primary objectives of the Constellation program (CxP): provide continued access to the International Space Station following the retirement of the Space Station and return humans to the moon. The J-2X system requirements identified to accomplish this were very challenging and the time expended over the five years following the beginning of the J- 2X effort have been noteworthy in the development of innovations in both the fields for liquid rocket propulsion and system engineering.

  17. Purinergic P2X7 receptor regulates lung surfactant secretion in a paracrine manner

    PubMed Central

    Mishra, Amarjit; Chintagari, Narendranath Reddy; Guo, Yujie; Weng, Tingting; Su, Lijing; Liu, Lin

    2011-01-01

    Alveolar epithelium is composed of alveolar epithelial cells of type I (AEC I) and type II (AEC II). AEC II secrete lung surfactant by means of exocytosis. P2X7 receptor (P2X7R), a P2 purinergic receptor, has been implicated in the regulation of synaptic transmission and inflammation. Here, we report that P2X7R, which is expressed in AEC I but not AEC II, is a novel mediator for the paracrine regulation of surfactant secretion in AEC II. In primary co-cultures of AEC I and AEC II benzoyl ATP (BzATP; an agonist of P2X7R) increased surfactant secretion, which was blocked by the P2X7R antagonist Brilliant Blue G. This effect was observed in AEC II co-cultured with human embryonic kidney HEK-293 cells stably expressing rat P2X7R, but not when co-cultured with AEC I in which P2X7R was knocked down or in co-cultures of AEC I and AEC II isolated from P2X7R−/− mice. BzATP-mediated secretion involved P2Y2 receptor signaling because it was reduced by the addition of the ATP scavengers apyrase and adenosine deaminase and the P2Y2 receptor antagonist suramin. However, the stimulation with BzATP might also release other substances that potentially increase surfactant secretion as a greater stimulation of secretion was observed in AEC II incubated with BzATP when co-cultured with E10 or HEK-293-P2X7R cells than with ATP alone. P2X7R−/− mice failed to increase surfactant secretion in response to hyperventilation, pointing to the physiological relevance of P2X7R in maintaining surfactant homeostasis in the lung. These results suggest that the activation of P2X7R increases surfactant secretion by releasing ATP from AEC I and subsequently stimulating P2Y2 receptors in AEC II. PMID:21266468

  18. New P2X3 receptor antagonists. Part 2: Identification and SAR of quinazolinones.

    PubMed

    Szántó, Gábor; Makó, Attila; Vágó, István; Hergert, Tamás; Bata, Imre; Farkas, Bence; Kolok, Sándor; Vastag, Mónika

    2016-08-15

    Numerous potent P2X3 antagonists have been discovered and the therapeutic potential of P2X3 antagonism already comprises proof-of-concept data obtained in clinical trials with the most advanced compound. We have lately reported the discovery and optimization of thia-triaza-tricycle compounds with potent P2X3 antagonistic properties. This Letter describes the SAR of a back-up series containing a 4-oxo-quinazoline central ring. The discovery of the highly potent compounds 51 is presented.

  19. 0.7-NA DUV step-and-scan system for 150-nm imaging with improved overlay

    NASA Astrophysics Data System (ADS)

    van Schoot, Jan B.; Bornebroek, Frank; Suddendorf, Manfred; Mulder, Melchior; van der Spek, Jeroen; Stoeten, Jan; Hunter, Adolph; Ruemmer, Peter

    1999-07-01

    To extend KrF lithography below the 180nm SIA design rule node in manufacturing, an advanced DUV step and scan system utilizing a lens with an NA up to 0.7 will be required to provide sufficient process latitude. Towards the SIA's 150nm design rule node, manufacturing challenges for 248nm lithography include contact hole printing, iso-dense bias control and adequate across the field CD uniformity. All will benefit from higher NA lenses. In the paper, result obtained on a PAS 5500/700B DUV Step and Scan system are presented. The system design is based on the PAS 5500/500 with a new 0.7NA Starlith lens, AERIAL II illuminator and ATHENA advanced alignment system. Imaging of dense and isolated lines at 180nm, 150nm and below as well as 180nm and 160nm contact holes is shown. In addition to imaging performance, image plane deviation, system distortion fingerprints, single-machine overlay and multiple-machine matching results are shown. Using the ATHENA alignment system, alignment reproducibility as well as overlay result on CMP wafers will be shown. It is concluded that this exposure tool is capable of delivering imaging and overlay performance required for mass production at the 150nm design rule node, with potential for R and D applications beyond.

  20. Locating influential nodes in complex networks

    NASA Astrophysics Data System (ADS)

    Malliaros, Fragkiskos D.; Rossi, Maria-Evgenia G.; Vazirgiannis, Michalis

    2016-01-01

    Understanding and controlling spreading processes in networks is an important topic with many diverse applications, including information dissemination, disease propagation and viral marketing. It is of crucial importance to identify which entities act as influential spreaders that can propagate information to a large portion of the network, in order to ensure efficient information diffusion, optimize available resources or even control the spreading. In this work, we capitalize on the properties of the K-truss decomposition, a triangle-based extension of the core decomposition of graphs, to locate individual influential nodes. Our analysis on real networks indicates that the nodes belonging to the maximal K-truss subgraph show better spreading behavior compared to previously used importance criteria, including node degree and k-core index, leading to faster and wider epidemic spreading. We further show that nodes belonging to such dense subgraphs, dominate the small set of nodes that achieve the optimal spreading in the network.

  1. Expandable and reconfigurable instrument node arrays

    NASA Technical Reports Server (NTRS)

    Hilliard, Lawrence M. (Inventor); Deshpande, Manohar (Inventor)

    2012-01-01

    An expandable and reconfigurable instrument node includes a feature detection means and a data processing portion in communication with the feature detection means, the data processing portion configured and disposed to process feature information. The instrument node further includes a phase locked loop (PLL) oscillator in communication with the data processing portion, the PLL oscillator configured and disposed to provide PLL information to the processing portion. The instrument node further includes a single tone transceiver and a pulse transceiver in communication with the PLL oscillator, the single tone transceiver configured and disposed to transmit or receive a single tone for phase correction of the PLL oscillator and the pulse transceiver configured and disposed to transmit and receive signals for phase correction of the PLL oscillator. The instrument node further includes a global positioning (GPA) receiver in communication with the processing portion, the GPS receiver configured and disposed to establish a global position of the instrument node.

  2. Locating influential nodes in complex networks

    PubMed Central

    Malliaros, Fragkiskos D.; Rossi, Maria-Evgenia G.; Vazirgiannis, Michalis

    2016-01-01

    Understanding and controlling spreading processes in networks is an important topic with many diverse applications, including information dissemination, disease propagation and viral marketing. It is of crucial importance to identify which entities act as influential spreaders that can propagate information to a large portion of the network, in order to ensure efficient information diffusion, optimize available resources or even control the spreading. In this work, we capitalize on the properties of the K-truss decomposition, a triangle-based extension of the core decomposition of graphs, to locate individual influential nodes. Our analysis on real networks indicates that the nodes belonging to the maximal K-truss subgraph show better spreading behavior compared to previously used importance criteria, including node degree and k-core index, leading to faster and wider epidemic spreading. We further show that nodes belonging to such dense subgraphs, dominate the small set of nodes that achieve the optimal spreading in the network. PMID:26776455

  3. High speed polling protocol for multiple node network

    NASA Technical Reports Server (NTRS)

    Kirkham, Harold (Inventor)

    1995-01-01

    The invention is a multiple interconnected network of intelligent message-repeating remote nodes which employs a remote node polling process performed by a master node by transmitting a polling message generically addressed to all remote nodes associated with the master node. Each remote node responds upon receipt of the generically addressed polling message by transmitting a poll-answering informational message and by relaying the polling message to other adjacent remote nodes.

  4. Two P2X1 receptor transcripts able to form functional channels are present in most human monocytes.

    PubMed

    López-López, Cintya; Jaramillo-Polanco, Josue; Portales-Pérez, Diana P; Gómez-Coronado, Karen S; Rodríguez-Meléndez, Jessica G; Cortés-García, Juan D; Espinosa-Luna, Rosa; Montaño, Luis M; Barajas-López, Carlos

    2016-12-15

    To characterize the presence and general properties of P2X1 receptors in single human monocytes we used RT-PCR, flow cytometry, and the patch-clamp and the two-electrode voltage-clamp techniques. Most human monocytes expressed the canonical P2X1 (90%) and its splicing variant P2X1del (88%) mRNAs. P2X1 receptor immunoreactivity was also observed in 70% of these cells. Currents mediated by P2X1 (EC50=1.9±0.8µm) and P2X1del (EC50 >1000µm) channels, expressed in Xenopus leavis oocytes, have different ATP sensitivity and kinetics. Both currents mediated by P2X1 and P2X1del channels kept increasing during the continuous presence of high ATP concentrations. Currents mediated by the native P2X1 receptors in human monocytes showed an EC50=6.3±0.2µm. Currents have kinetics that resemble those observed for P2X1 and P2X1del receptors in oocytes. Our study is the first to demonstrate the expression of P2X1 transcript and its splicing variant P2X1del in most human monocytes. We also, for the first time, described functional homomeric P2X1del channels and demonstrated that currents mediated by P2X1 or P2X1del receptors, during heterologous expression, increased in amplitude when activated with high ATP concentrations in a similar fashion to those channels that increase their conductance under similar conditions, such as P2X7, P2X2, and P2X4 channels.

  5. Thermal expansion of Cr{sub 2x}Fe{sub 2-2x}Mo{sub 3}O{sub 12}, Al{sub 2x}Fe{sub 2-2x}Mo{sub 3}O{sub 12} and Al{sub 2x}Cr{sub 2-2x}Mo{sub 3}O{sub 12} solid solutions

    SciTech Connect

    Ari, M.; Jardim, P.M.; Marinkovic, B.A. Rizzo, F.; Ferreira, F.F.

    2008-06-15

    The transition temperature from monoclinic to orthorhombic and the thermal expansion of the orthorhombic phase were investigated for three systems of the family A{sub 2}M{sub 3}O{sub 12}: Cr{sub 2x}Fe{sub 2-2x}Mo{sub 3}O{sub 12}, Al{sub 2x}Fe{sub 2-2x}Mo{sub 3}O{sub 12} and Al{sub 2x}Cr{sub 2-2x}Mo{sub 3}O{sub 12}. It was possible to obtain a single-phase solid solution in all studied samples (x=0, 0.1, 0.3, 0.5, 0.7, 0.9 and 1). A linear relationship between the transition temperature and the fraction of A{sup 3+} cations (x) was observed for each system. In all orthorhombic solid solutions studied here the observed thermal expansion was anisotropic. These anisotropic thermal expansion properties of crystallographic axes a, b and c result in a low positive or near-zero overall linear coefficient of thermal expansion ({alpha}{sub l}={alpha}{sub V}/3). The relationship between the size of A{sup 3+} cations in A{sub 2}M{sub 3}O{sub 12} and the coefficient of thermal expansion is discussed. Near-zero thermal expansion of Cr{sub 2}Mo{sub 3}O{sub 12} is explained by the behavior of Cr-O and Mo-O bond distances, Cr-Mo non-bond distances and Cr-O-Mo bond angles with increasing temperature, estimated by Rietveld analysis of synchrotron X-ray powder diffraction data. - Graphical abstract: In this figure, all published overall linear coefficients of thermal expansion for orthorhombic A{sub 2}M{sub 3}O{sub 12} family obtained through diffraction methods as a function of A{sup 3+} cation radii size, together with dilatometric results, are plotted. Our results indicate that Cr{sub 2}Mo{sub 3}O{sub 12} does not exactly follow the established relationship.

  6. Label-free Detection of Lymph Node Metastases with US-guided Functional Photoacoustic Imaging

    PubMed Central

    Luke, Geoffrey P.

    2015-01-01

    Purpose To determine the ability of ultrasonography (US)-guided spectroscopic photoacoustic (sPA) imaging to depict changes in blood oxygen saturation (SO2) in metastatic lymph nodes of a mouse model of oral cancer. Materials and Methods All studies were performed by following protocols approved by the institutional animal care and use committee at the University of Texas at Austin. Coregistered US and photoacoustic images were acquired spanning volumes containing a total of 31 lymph nodes in 17 female nu/nu mice. The mice were either healthy (three mice, five nodes) or bearing a primary tumor consisting of luciferase-labeled FaDu cells (14 mice, 26 nodes). Ten photoacoustic images acquired with optical wavelengths spanning from 680 to 860 nm were spectrally unmixed by using a linear least-squares method to obtain sPA images. After imaging, histologic analysis enabled confirmation of the presence of micrometastases. Generalized estimating equations were used to compare metastatic and normal lymph nodes, with a P value of .05 taken to indicate a significant difference. Sensitivity and specificity were determined with a receiver operator characteristic curve constructed from the background-subtracted SO2 values. Results Metastatic lymph nodes (n = 7) exhibited a significantly (P = .018) lower spatially averaged background-subtracted SO2 (mean, 5.4% ± 3.5 [standard error]) when compared with lymph nodes without metastases (mean, 13.7% ± 1.3; n = 24). This effect was observed throughout the entire volume of the nodes rather than being limited to the metastatic foci. The change in SO2, which was inversely related to the size of the metastasis, was detectable in metastases as small as 2.6 × 10−3 mm3. Conclusion The results show that US-guided sPA imaging is capable of depicting changes in SO2 in lymph nodes that were correlated with metastatic invasion. © RSNA, 2015 PMID:25997030

  7. New synthesis of excellent visible-light TiO{sub 2-x}N{sub x} photocatalyst using a very simple method

    SciTech Connect

    Li Danzhen Huang Hanjie; Chen Xu; Chen Zhixin; Li Wenjuan; Ye Dong; Fu Xianzhi

    2007-09-15

    An excellent visible-light-responsive (from 400 to 550 nm) TiO{sub 2-x}N{sub x} photocatalyst was prepared by a simple wet method. Hydrazine was used as a new nitrogen resource in this paper. Self-made amorphous titanium dioxide precursor powders were dipped into hydrazine hydrate, and calcined at low temperature (110 deg. C) in the air. The TiO{sub 2-x}N{sub x} was successfully synthesized, following by spontaneous combustion. The photocatalyst was characterized by X-ray diffraction (XRD), Brunauer-Emmett-Teller (BET), transmission electron microscope (TEM), UV-Vis diffuse reflectance spectrometer (DRS), and X-ray photoelectron spectroscopy (XPS). Analysis of XPS indicated that N atoms were incorporated into the lattice of the titania crystal during the combustion of hydrazine on the surface of TiO{sub 2}. Ethylene was selected as a target pollutant under visible-light excitation to evaluate the activity of this photocatalyst. The newly prepared TiO{sub 2-x}N{sub x} photocatalyst with strong photocatalytic activity and high photochemical stability under visible-light irradiation was firstly demonstrated in the experiment. - Graphical abstract: The excellent visible-light-responsive (from 400 to 550 nm) TiO{sub 2-x}N{sub x} photocatalyst was prepared by a simple wet method. Hydrazine was used as a new nitrogen resource in this paper. In the experiment, a strong photocatalytic activity with high photochemical stability under visible-light irradiation was demonstrated.

  8. Window type: 2x3 fixed multipaned steel window flanked by 1x3 ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    Window type: 2x3 fixed multipaned steel window flanked by 1x3 multipaned steel casements. Concrete sill and spandrel also illustrated. Building 43, facing east - Harbor Hills Housing Project, 26607 Western Avenue, Lomita, Los Angeles County, CA

  9. Sub-180 nm generation with borate crystal

    NASA Astrophysics Data System (ADS)

    Qu, Chen; Yoshimura, Masashi; Tsunoda, Jun; Kaneda, Yushi; Imade, Mamoru; Sasaki, Takatomo; Mori, Yusuke

    2014-10-01

    We demonstrated a new scheme for the generation of 179 nm vacuum-ultraviolet (VUV) light with an all-solid-state laser system. It was achieved by mixing the deep-ultraviolet (DUV) of 198.8 nm and the infrared (IR) of 1799.9 nm. While CsB3O5 (CBO) did not satisfy the phase-matching at around 180 nm, 179 nm output was generated with LiB3O5 (LBO) for the first time. The phase-matching property of LBO at around 180 nm was also investigated. There was small deviation from theoretical curve in the measurement, which is still considered reasonable.

  10. A logistic regression model for predicting axillary lymph node metastases in early breast carcinoma patients.

    PubMed

    Xie, Fei; Yang, Houpu; Wang, Shu; Zhou, Bo; Tong, Fuzhong; Yang, Deqi; Zhang, Jiaqing

    2012-01-01

    Nodal staging in breast cancer is a key predictor of prognosis. This paper presents the results of potential clinicopathological predictors of axillary lymph node involvement and develops an efficient prediction model to assist in predicting axillary lymph node metastases. Seventy patients with primary early breast cancer who underwent axillary dissection were evaluated. Univariate and multivariate logistic regression were performed to evaluate the association between clinicopathological factors and lymph node metastatic status. A logistic regression predictive model was built from 50 randomly selected patients; the model was also applied to the remaining 20 patients to assess its validity. Univariate analysis showed a significant relationship between lymph node involvement and absence of nm-23 (p = 0.010) and Kiss-1 (p = 0.001) expression. Absence of Kiss-1 remained significantly associated with positive axillary node status in the multivariate analysis (p = 0.018). Seven clinicopathological factors were involved in the multivariate logistic regression model: menopausal status, tumor size, ER, PR, HER2, nm-23 and Kiss-1. The model was accurate and discriminating, with an area under the receiver operating characteristic curve of 0.702 when applied to the validation group. Moreover, there is a need discover more specific candidate proteins and molecular biology tools to select more variables which should improve predictive accuracy.

  11. A Logistic Regression Model for Predicting Axillary Lymph Node Metastases in Early Breast Carcinoma Patients

    PubMed Central

    Xie, Fei; Yang, Houpu; Wang, Shu; Zhou, Bo; Tong, Fuzhong; Yang, Deqi; Zhang, Jiaqing

    2012-01-01

    Nodal staging in breast cancer is a key predictor of prognosis. This paper presents the results of potential clinicopathological predictors of axillary lymph node involvement and develops an efficient prediction model to assist in predicting axillary lymph node metastases. Seventy patients with primary early breast cancer who underwent axillary dissection were evaluated. Univariate and multivariate logistic regression were performed to evaluate the association between clinicopathological factors and lymph node metastatic status. A logistic regression predictive model was built from 50 randomly selected patients; the model was also applied to the remaining 20 patients to assess its validity. Univariate analysis showed a significant relationship between lymph node involvement and absence of nm-23 (p = 0.010) and Kiss-1 (p = 0.001) expression. Absence of Kiss-1 remained significantly associated with positive axillary node status in the multivariate analysis (p = 0.018). Seven clinicopathological factors were involved in the multivariate logistic regression model: menopausal status, tumor size, ER, PR, HER2, nm-23 and Kiss-1. The model was accurate and discriminating, with an area under the receiver operating characteristic curve of 0.702 when applied to the validation group. Moreover, there is a need discover more specific candidate proteins and molecular biology tools to select more variables which should improve predictive accuracy. PMID:23012578

  12. Sentinel lymph nodes detection with an imaging system using Patent Blue V dye as fluorescent tracer

    NASA Astrophysics Data System (ADS)

    Tellier, F.; Steibel, J.; Chabrier, R.; Rodier, J. F.; Pourroy, G.; Poulet, P.

    2013-03-01

    Sentinel lymph node biopsy is the gold standard to detect metastatic invasion from primary breast cancer. This method can help patients avoid full axillary chain dissection, thereby decreasing the risk of morbidity. We propose an alternative to the traditional isotopic method, to detect and map the sentinel lymph nodes. Indeed, Patent Blue V is the most widely used dye in clinical routine for the visual detection of sentinel lymph nodes. A Recent study has shown the possibility of increasing the fluorescence quantum yield of Patent Blue V, when it is bound to human serum albumin. In this study we present a preclinical fluorescence imaging system to detect sentinel lymph nodes labeled with this fluorescent tracer. The setup is composed of a black and white CCD camera and two laser sources. One excitation source with a laser emitting at 635 nm and a second laser at 785 nm to illuminate the region of interest. The prototype is operated via a laptop. Preliminary experiments permitted to determine the device sensitivity in the μmol.L-1 range as regards the detection of PBV fluorescence signals. We also present a preclinical evaluation performed on Lewis rats, during which the fluorescence imaging setup detected the accumulation and fixation of the fluorescent dye on different nodes through the skin.

  13. 7-nm e-beam resist sensitivity characterization

    NASA Astrophysics Data System (ADS)

    Zweber, Amy; Toda, Yusuke; Sakamoto, Yoshifumi; Faure, Thomas; Rankin, Jed; Nash, Steven; Kagawa, Masayuki; Fahrenkopf, Michael; Isogawa, Takeshi; Wistrom, Richard

    2016-10-01

    Over time mask makers have been driven to low sensitivity e-beam resist materials to meet lithographic patterning needs. For 7-nm logic node, resolution enhancement techniques continue to evolve bringing more complexity on mask and additional mask builds per layer. As demonstrated in literature, low sensitivity materials are needed for low line edge roughness (LER) but impact write tool through put. In characterizing resist sensitivity for 7-nm, we explore more broadly what advantages and disadvantages moving to lower sensitivity resist materials brings, where LER, critical dimension uniformity, resolution, fogging, image placement, and write time results and trends are presented. In this paper, resist material performance are reported for sensitivities ranging from 20 to 130 μC/cm2 at 50% proximity effect correction, where the exposure will be using a single beam platform. Materials examined include negative tone resist types with chemical amplification and positive tone without chemical amplification focusing on overall trends for 7-nm e-beam resist performance.

  14. Radiosensitizing Effect of P2X7 Receptor Antagonist on Melanoma in vitro and in vivo.

    PubMed

    Tanamachi, Keisuke; Nishino, Keisuke; Mori, Natsuki; Suzuki, Toshihiro; Tanuma, Sei-Ichi; Abe, Ryo; Tsukimoto, Mitsutoshi

    2017-03-24

    Melanoma is highly malignant, and generally exhibits radioresistance, responding poorly to radiation therapy. We previously reported that activation of P2X7, P2Y6, and P2Y12 receptors is involved in the DNA damage response after γ-irradiation of human lung adenocarcinoma A549 cells. However, it is not clear whether these receptors are also involved in the case of melanoma cells, although P2X7 receptor is highly expressed in various cancers, including melanoma. Here, we show that P2X7 receptor antagonist enhances radiation-induced cytotoxicity in B16 melanoma cells in vitro and in vivo. We confirmed that these cells express P2X7 receptor mRNA and exhibit P2X7 receptor-mediated activities, such as ATP-induced pore formation and cytotoxicity. We further examined the radiosensitizing effect of P2X7 receptor antagonist Brilliant Blue G (BBG) in vitro by colony formation assay of B16 cells. γ-Irradiation dose-dependently reduced cell survival, and pretreatment with BBG enhanced the radiation-induced cytotoxicity. BBG pretreatment also decreased the number of DNA repair foci in nuclei, supporting involvement of P2X7 receptor in the DNA damage response. Finally, we investigated the radiosensitizing effect of BBG on B16 melanoma cells inoculated into the hind footpad of C57BL/6 mice. Neither 1 Gy γ-irradiation alone nor BBG alone suppressed the increase of tumor volume, but the combination of irradiation and BBG significantly suppressed tumor growth. Our results suggest that P2X7 receptor antagonist BBG has a radiosensitizing effect in melanoma in vitro and in vivo. BBG, which is used as a food coloring agent, appears to be a promising candidate as a radiosensitizer.

  15. The role of P2X7 receptors in a rodent PCP-induced schizophrenia model

    PubMed Central

    Koványi, Bence; Csölle, Cecilia; Calovi, Stefano; Hanuska, Adrienn; Kató, Erzsébet; Köles, László; Bhattacharya, Anindya; Haller, József; Sperlágh, Beáta

    2016-01-01

    P2X7 receptors (P2X7Rs) are ligand-gated ion channels sensitive to extracellular ATP. Here we examined for the first time the role of P2X7R in an animal model of schizophrenia. Using the PCP induced schizophrenia model we show that both genetic deletion and pharmacological inhibition of P2X7Rs alleviate schizophrenia-like behavioral alterations. In P2rx7+/+ mice, PCP induced hyperlocomotion, stereotype behavior, ataxia and social withdrawal. In P2X7 receptor deficient mice (P2rx7−/−), the social interactions were increased, whereas the PCP induced hyperlocomotion and stereotype behavior were alleviated. The selective P2X7 receptor antagonist JNJ-47965567 partly replicated the effect of gene deficiency on PCP-induced behavioral changes and counteracted PCP-induced social withdrawal. We also show that PCP treatment upregulates and increases the functional responsiveness of P2X7Rs in the prefrontal cortex of young adult animals. The amplitude of NMDA evoked currents recorded from layer V pyramidal neurons of cortical slices were slightly decreased by both genetic deletion of P2rx7 and by JNJ-47965567. PCP induced alterations in mRNA expression encoding schizophrenia-related genes, such as NR2A, NR2B, neuregulin 1, NR1 and GABA α1 subunit were absent in the PFC of young adult P2rx7−/− animals. Our findings point to P2X7R as a potential therapeutic target in schizophrenia. PMID:27824163

  16. Porphyromonas gingivalis fimbriae dampen P2X7-dependent IL-1β secretion

    PubMed Central

    Morandini, Ana Carolina; Ramos-Junior, Erivan S.; Potempa, Jan; Nguyen, Ky-Anh; Oliveira, Ana Carolina; Bellio, Maria; Ojcius, David M.; Scharfstein, Julio; Coutinho-Silva, Robson

    2014-01-01

    Porphyromonas gingivalis is a major contributor to the pathogenesis of periodontitis, an infection-driven inflammatory disease that leads to bone destruction. This pathogen stimulates pro-IL-1β synthesis but not mature IL-1β secretion, unless the P2X7 receptor is activated by extracellular ATP. Here, we investigated the role of Pg fimbriae in eATP-induced IL-1β release. Bone marrow derived macrophages (BMDMs) from wild type (WT) or P2X7-deficient mice were infected with Pg (strain 381) or isogenic fimbriae deficient (strain DPG3) with or without subsequent eATP stimulation. DPG3 induced higher IL-1β secretion after eATP stimulation compared to 381 in WT BMDMs, but not in P2X7-deficient cells. This mechanism was dependent of K+ efflux and Ca2+-iPLA2 activity. Accordingly, non-fimbriated Pg failed to inhibit apoptosis via eATP/P2X7-pathway. Furthermore, Pg-driven stimulation of IL-1β was TLR2- and MyD88-dependent, and irrespective of fimbriae expression. Fimbriae-dependent down-modulation of IL-1β was selective, as levels of other cytokines remained unaffected by P2X7 deficiency. Confocal microscopy demonstrated the presence of discrete P2X7 expression in the absence of Pg stimulation which was enhanced by 381-stimulated cells. Notably, DPG3-infected macrophages revealed a distinct pattern of P2X7 receptor expression with a markedly foci formation. Collectively, these data demonstrate that eATP-induced IL-1β secretion is impaired by Pg fimbriae in a P2X7-dependent manner. PMID:24925032

  17. Desensitization properties of P2X3 receptors shaping pain signaling

    PubMed Central

    Giniatullin, Rashid; Nistri, Andrea

    2013-01-01

    ATP-gated P2X3 receptors are mostly expressed by nociceptive sensory neurons and participate in transduction of pain signals. P2X3 receptors show a combination of fast desensitization onset and slow recovery. Moreover, even low nanomolar agonist concentrations unable to evoke a response, can induce desensitization via a phenomenon called “high affinity desensitization.” We have also observed that recovery from desensitization is agonist-specific and can range from seconds to minutes. The recovery process displays unusually high temperature dependence. Likewise, recycling of P2X3 receptors in peri-membrane regions shows unexpectedly large temperature sensitivity. By applying kinetic modeling, we have previously shown that desensitization characteristics of P2X3 receptor are best explained with a cyclic model of receptor operation involving three agonist molecules binding a single receptor and that desensitization is primarily developing from the open receptor state. Mutagenesis experiments suggested that desensitization depends on a certain conformation of the ATP binding pocket and on the structure of the transmembrane domains forming the ion pore. Further molecular determinants of desensitization have been identified by mutating the intracellular N- and C-termini of P2X3 receptor. Unlike other P2X receptors, the P2X3 subtype is facilitated by extracellular calcium that acts via specific sites in the ectodomain neighboring the ATP binding pocket. Thus, substitution of serine275 in this region (called “left flipper”) converts the natural facilitation induced by extracellular calcium to receptor inhibition. Given their strategic location in nociceptive neurons and unique desensitization properties, P2X3 receptors represent an attractive target for development of new analgesic drugs via promotion of desensitization aimed at suppressing chronic pain. PMID:24367291

  18. Critical Evaluation of P2X7 Receptor Antagonists in Selected Seizure Models

    PubMed Central

    Fischer, Wolfgang; Franke, Heike; Krügel, Ute; Müller, Heiko; Dinkel, Klaus; Lord, Brian; Letavic, Michael A.; Henshall, David C.; Engel, Tobias

    2016-01-01

    The ATP-gated P2X7 receptor (P2X7R) is a non-selective cation channel which senses high extracellular ATP concentrations and has been suggested as a target for the treatment of neuroinflammation and neurodegenerative diseases. The use of P2X7R antagonists may therefore be a viable approach for treating CNS pathologies, including epileptic disorders. Recent studies showed anticonvulsant potential of P2X7R antagonists in certain animal models. To extend this work, we tested three CNS-permeable P2X7R blocker (Brilliant Blue G, AFC-5128, JNJ-47965567) and a natural compound derivative (tanshinone IIA sulfonate) in four well-characterized animal seizure models. In the maximal electroshock seizure threshold test and the pentylenetetrazol (PTZ) seizure threshold test in mice, none of the four compounds demonstrated anticonvulsant effects when given alone. Notably, in combination with carbamazepine, both AFC-5128 and JNJ-47965567 increased the threshold in the maximal electroshock seizure test. In the PTZ-kindling model in rats, useful for testing antiepileptogenic activities, Brilliant Blue G and tanshinone exhibited a moderate retarding effect, whereas the potent P2X7R blocker AFC-5128 and JNJ-47965567 showed a significant and long-lasting delay in kindling development. In fully kindled rats, the investigated compounds revealed modest effects to reduce the mean seizure stage. Furthermore, AFC-5128- and JNJ-47965567-treated animals displayed strongly reduced Iba 1 and GFAP immunoreactivity in the hippocampal CA3 region. In summary, our results show that P2X7R antagonists possess no remarkable anticonvulsant effects in the used acute screening tests, but can attenuate chemically-induced kindling. Further studies would be of interest to support the concept that P2X7R signalling plays a crucial role in the pathogenesis of epileptic disorders. PMID:27281030

  19. Transport optimization considering the node aggregation ability

    NASA Astrophysics Data System (ADS)

    Liu, Gang; Li, Lian; Guo, Jiawei; Li, Zheng

    2015-10-01

    Using the theories of complex networks and gravitational field, we study the dynamic routing process under the framework of node gravitational field, define the equation of gravitation of travel path to data package and introduce two parameters α and γ for adjusting the dependences of transmission data on the unblocked degree of node, the transmission capacity of node and the path length. Based on the path's attraction, a gravitational field routing strategy under node connection ability constraint is proposed with considering the affect of node aggregation ability to transport process, and a parameter is used to adjust the control strength of routing process to node aggregation ability. In order to clarify the efficiency of suggested method, we introduce an order parameter η to measure the throughput of the network by the critical value of phase transition from free state to congestion state, and analyze the distribution of betweenness centrality and traffic jam. Simulation results show that, compared with the traditional shortest path routing strategy, our method greatly improve the throughput of a network, balance the network traffic load and most of the network nodes are used efficiently. Moreover, the network throughput is maximized under μ = -1, and the transmission performance of the algorithm is independent of the values of α and γ, which indicate the routing strategy is stable and reliable.

  20. Node Immunization with Time-Sensitive Restrictions

    PubMed Central

    Cui, Wen; Gong, Xiaoqing; Liu, Chen; Xu, Dan; Chen, Xiaojiang; Fang, Dingyi; Tang, Shaojie; Wu, Fan; Chen, Guihai

    2016-01-01

    When we encounter a malicious rumor or an infectious disease outbreak, immunizing k nodes of the relevant network with limited resources is always treated as an extremely effective method. The key challenge is how we can insulate limited nodes to minimize the propagation of those contagious things. In previous works, the best k immunised nodes are selected by learning the initial status of nodes and their strategies even if there is no feedback in the propagation process, which eventually leads to ineffective performance of their solutions. In this paper, we design a novel vaccines placement strategy for protecting much more healthy nodes from being infected by infectious nodes. The main idea of our solution is that we are not only utilizing the status of changing nodes as auxiliary knowledge to adjust our scheme, but also comparing the performance of vaccines in various transmission slots. Thus, our solution has a better chance to get more benefit from these limited vaccines. Extensive experiments have been conducted on several real-world data sets and the results have shown that our algorithm has a better performance than previous works. PMID:27983680

  1. P2X7 receptors induce degranulation in human mast cells.

    PubMed

    Wareham, Kathryn J; Seward, Elizabeth P

    2016-06-01

    Mast cells play important roles in host defence against pathogens, as well as being a key effector cell in diseases with an allergic basis such as asthma and an increasing list of other chronic inflammatory conditions. Mast cells initiate immune responses through the release of newly synthesised eicosanoids and the secretion of pre-formed mediators such as histamine which they store in specialised granules. Calcium plays a key role in regulating both the synthesis and secretion of mast-cell-derived mediators, with influx across the membrane, in particular, being necessary for degranulation. This raises the possibility that calcium influx through P2X receptors may lead to antigen-independent secretion of histamine and other granule-derived mediators from human mast cells. Here we show that activation of P2X7 receptors with both ATP and BzATP induces robust calcium rises in human mast cells and triggers their degranulation; both effects are blocked by the P2X7 antagonist AZ11645373, or the removal of calcium from the extracellular medium. Activation of P2X1 receptors with αβmeATP also induces calcium influx in human mast cells, which is significantly reduced by both PPADS and NF 449. P2X1 receptor activation, however, does not trigger degranulation. The results indicate that P2X7 receptors may play a significant role in contributing to the unwanted activation of mast cells in chronic inflammatory conditions where extracellular ATP levels are elevated.

  2. P2X4: an ATP-activated ionotropic receptor cloned from rat brain.

    PubMed Central

    Soto, F; Garcia-Guzman, M; Gomez-Hernandez, J M; Hollmann, M; Karschin, C; Stühmer, W

    1996-01-01

    Extracellular ATP exerts pronounced biological actions in virtually every organ or tissue that has been studied. In the central and peripheral nervous system, ATP acts as a fast excitatory transmitter in certain synaptic pathways [Evans, R.J., Derkach, V. & Surprenant, A. (1992) Nature (London) 357, 503-505; Edwards, F.A., Gigg, A.J. & Colquhoun, D. (1992) Nature (London) 359, 144-147]. Here, we report the cloning and characterization of complementary DNA from rat brain, encoding an additional member (P2X4) of the emerging multigenic family of ligand-gated ATP channels, the P2X receptors. Expression in Xenopus oocytes gives an ATP-activated cation-selective channel that is highly permeable to Ca2+ and whose sensitivity is modulated by extracellular Zn2+. Surprisingly, the current elicited by ATP is almost insensitive to the common P2X antagonist suramin. In situ hybridization reveals the expression of P2X4 mRNA in central nervous system neurons. Northern blot and reverse transcription-PCR (RT-PCR) analysis demonstrate a wide distribution of P2X4 transcripts in various tissues, including blood vessels and leukocytes. This suggests that the P2X4 receptor might mediate not only ATP-dependent synaptic transmission in the central nervous system but also a wide repertoire of biological responses in diverse tissues. Images Fig. 3 Fig. 4 PMID:8622997

  3. Evaluation of adenine as scaffold for the development of novel P2X3 receptor antagonists.

    PubMed

    Lambertucci, Catia; Sundukova, Mayya; Kachare, Dhuldeo D; Panmand, Deepak S; Dal Ben, Diego; Buccioni, Michela; Marucci, Gabriella; Marchenkova, Anna; Thomas, Ajiroghene; Nistri, Andrea; Cristalli, Gloria; Volpini, Rosaria

    2013-07-01

    Ligands that selectively block P2X3 receptors localized on nociceptive sensory fibres may be useful for the treatment of chronic pain conditions including neuropathic pain, migraine, and inflammatory pain. With the aim at exploring the suitability of adenine moiety as a scaffold for the development of antagonists of this receptor, a series of 9-benzyl-2-aminoadenine derivatives were designed and synthesized. These new compounds were functionally evaluated at rat or human P2X3 receptors expressed in human embryonic kidney (HEK) cells and on native P2X3 receptors from mouse trigeminal ganglion sensory neurons using patch clamp recording under voltage clamp configuration. The new molecules behaved as P2X3 antagonists, as they rapidly and reversibly inhibited (IC50 in the low micromolar range) the membrane currents induced via P2X3 receptor activation by the full agonist α,β-methyleneATP. Introduction of a small lipophilic methyl substituent at the 6-amino group enhanced the activity, in comparison to the corresponding unsubstituted derivative, resulting in the 9-(5-iodo-2-isopropyl-4-methoxybenzyl)-N(6)-methyl-9H-purine-2,6-diamine (24), which appears to be a good antagonist on recombinant and native P2X3 receptors with IC50 = 1.74 ± 0.21 μM.

  4. Effects of Ag-Doping on Thermoelectric Properties of Ca(2-x)AgxSi Alloys

    NASA Astrophysics Data System (ADS)

    Duan, Xingkai; Hu, Konggang; Kuang, Jing; Jiang, Yuezhen; Yi, Dengliang

    2016-11-01

    Ca(2-x)AgxSi (0 ≤ x ≤ 0.1) with 47.5% excess of Ca alloys were fabricated by melting in a tantalum tube and hot pressing technique. Phase structures of the samples were studied by means of x-ray diffraction. The electrical conductivity and Seebeck coefficient of Ca(2-x)AgxSi alloys were studied in the temperature range of 300-873 K. The electrical conductivity of the Ag-doped samples increases within the whole test temperature range. All samples show p-type semiconductor behavior. The electrical conductivity decreases with increasing temperature from 300 K to 873 K, which is typically observed for a degenerate semiconductor. Compared with the undoped samples, Ag-doping (x = 0.04-0.1) results in decreases of Seebeck coefficient, especially Ca(2-x)AgxSi with x = 0.1. The thermal conductivity of the doped samples gradually increases with increasing the Ag-doping content. The Ca(2-x)AgxSi with x = 0.02 sample exhibits the lowest thermal conductivity within the whole test temperature range. The ZT values of Ca(2-x)AgxSi with x = 0.02 sample have an enhancement in the temperature range of 300-873 K by contrast with those of the Ca2Si sample. The maximum ZT value is 0.16 at 837 k, which is observed for the Ca(2-x)AgxSi with x = 0.04 sample.

  5. Transcription factor IRF5 drives P2X4R+-reactive microglia gating neuropathic pain

    PubMed Central

    Masuda, Takahiro; Iwamoto, Shosuke; Yoshinaga, Ryohei; Tozaki-Saitoh, Hidetoshi; Nishiyama, Akira; Mak, Tak W.; Tamura, Tomohiko; Tsuda, Makoto; Inoue, Kazuhide

    2014-01-01

    In response to neuronal injury or disease, microglia adopt distinct reactive phenotypes via the expression of different sets of genes. Spinal microglia expressing the purinergic P2X4 receptor (P2X4R) after peripheral nerve injury (PNI) are implicated in neuropathic pain. Here we show that interferon regulatory factor-5 (IRF5), which is induced in spinal microglia after PNI, is responsible for direct transcriptional control of P2X4R. Upon stimulation of microglia by fibronectin, IRF5 induced de novo expression of P2X4R by directly binding to the promoter region of the P2rx4 gene. Mice lacking Irf5 did not upregulate spinal P2X4R after PNI, and also exhibited substantial resistance to pain hypersensitivity. Furthermore, we found that expression of IRF5 in microglia is regulated by IRF8. Thus, an IRF8-IRF5 transcriptional axis may contribute to shifting spinal microglia toward a P2X4R-expressing reactive state after PNI. These results may provide a new target for treating neuropathic pain. PMID:24818655

  6. Human P2X7 receptor activation induces the rapid shedding of CXCL16.

    PubMed

    Pupovac, Aleta; Foster, Christopher M; Sluyter, Ronald

    2013-03-22

    Activation of the purinergic P2X7 receptor by extracellular ATP induces the shedding of cell-surface molecules including the low-affinity IgE receptor, CD23 from leukocytes. CD23 is a known substrate of a disintegrin and metalloprotease (ADAM)10. The aim of the current study was to determine if P2X7 activation induced the shedding of the chemokine CXCL16, an ADAM10 substrate. Using immunolabelling and flow cytometry we demonstrate that human RPMI 8226 multiple myeloma B cells, which have been previously shown to express P2X7, also express CXCL16. Flow cytometric and ELISA measurements of ATP-induced loss of cell-surface CXCL16 showed that ATP treatment of RPMI 8226 cells induced the rapid shedding of CXCL16. Treatment of RPMI 8226 cells with the specific P2X7 antagonists, AZ10606120 and KN-62 impaired ATP-induced CXCL16 shedding by ~86% and ~90% respectively. RT-PCR demonstrated that ADAM10 is expressed in these cells and treatment of cells with the ADAM10 inhibitor, GI254023X, impaired ATP-induced CXCL16 shedding by ~87%. GI254023X also impaired P2X7-induced CD23 shedding by ∼57%. This data indicates that human P2X7 activation induces the rapid shedding of CXCL16 and that this process involves ADAM10.

  7. Allosteric modulation of ATP-gated P2X receptor channels

    PubMed Central

    Coddou, Claudio; Stojilkovic, Stanko S.; Huidobro-Toro, J. Pablo

    2013-01-01

    Seven mammalian purinergic receptor subunits, denoted P2X1 to P2X7, and several spliced forms of these subunits have been cloned. When heterologously expressed, these cDNAs encode ATP-gated non-selective cation channels organized as trimers. All activated receptors produce cell depolarization and promote Ca2+ influx through their pores and indirectly by activating voltage-gated calcium channels. However, the biophysical and pharmacological properties of these receptors differ considerably, and the majority of these subunits are also capable of forming heterotrimers with other members of the P2X receptor family, which confers further different properties. These channels have three ATP binding domains, presumably located between neighboring subunits, and occupancy of at least two binding sites is needed for their activation. In addition to the orthosteric binding sites for ATP, these receptors have additional allosteric sites that modulate the agonist action at receptors, including sites for trace metals, protons, neurosteroids, reactive oxygen species and phosphoinositides. The allosteric regulation of P2X receptors is frequently receptor-specific and could be a useful tool to identify P2X members in native tissues and their roles in signaling. The focus of this review is on common and receptor-specific allosteric modulation of P2X receptors and the molecular base accounting for allosteric binding sites. PMID:21639805

  8. Enhanced bolometric properties of TiO2-x thin films by thermal annealing

    NASA Astrophysics Data System (ADS)

    Ashok Kumar Reddy, Y.; Shin, Young Bong; Kang, In-Ku; Lee, Hee Chul; Sreedhara Reddy, P.

    2015-07-01

    The effect of thermal annealing on the bolometric properties of TiO2-x films was investigated. The test-patterned TiO2-x samples were annealed at 300 °C temperature in order to enhance their structural and electrical properties for effective infrared image sensor device applications. The crystallinity was changed from amorphous to rutile/anatase in annealed TiO2-x films. Compared to the as-deposited samples, a decrement of the band gap and a decrease of the electrical resistivity were perceived in annealed samples. We found that the annealed samples show linear current-voltage (I-V) characteristic performance, which implies that ohmic contact was well formed at the interface between the TiO2-x and the Ti electrode. Moreover, the annealed TiO2-x sample had a significantly low 1/f noise parameter (1.21 × 10-13) with a high bolometric parameter (β) value compared to those of the as-deposited samples. As a result, the thermal annealing process can be used to prepare TiO2-x film for a high-performance bolometric device.

  9. Ependymal cells along the lateral ventricle express functional P2X(7) receptors.

    PubMed

    Genzen, Jonathan R; Platel, Jean-Claude; Rubio, Maria E; Bordey, Angelique

    2009-09-01

    Ependymal cells line the cerebral ventricles and are located in an ideal position to detect central nervous system injury and inflammation. The signaling mechanisms of ependymal cells, however, are poorly understood. As extracellular adenosine 5'-triphosphate is elevated in the context of cellular damage, experiments were conducted to determine whether ependymal cells along the mouse subventricular zone (SVZ) express functional purinergic receptors. Using whole-cell patch clamp recording, widespread expression of P2X(7) receptors was detected on ependymal cells based on their antagonist sensitivity profile and absence of response in P2X(7) (-/-) mice. Immunocytochemistry confirmed the expression of P2X(7) receptors, and electron microscopy demonstrated that P2X(7) receptors are expressed on both cilia and microvilli. Ca(2+) imaging showed that P2X(7) receptors expressed on cilia are indeed functional. As ependymal cells are believed to function as partner cells in the SVZ neurogenic niche, P2X(7) receptors may play a role in neural progenitor response to injury and inflammation.

  10. Discovery of Potent Antiallodynic Agents for Neuropathic Pain Targeting P2X3 Receptors.

    PubMed

    Jung, Young-Hwan; Kim, Yeo Ok; Lin, Hai; Cho, Joong-Heui; Park, Jin-Hee; Lee, So-Deok; Bae, Jinsu; Kang, Koon Mook; Kim, Yoon-Gyoon; Pae, Ae Nim; Ko, Hyojin; Park, Chul-Seung; Yoon, Myung Ha; Kim, Yong-Chul

    2017-04-06

    Antagonism of the P2X3 receptor is one of the potential therapeutic strategies for the management of neuropathic pain because P2X3 receptors are predominantly localized on small to medium diameter C- and Aδ-fiber primary afferent neurons, which are related to the pain-sensing system. In this study, 5-hydroxy pyridine derivatives were designed, synthesized, and evaluated for their in vitro biological activities by two-electrode voltage clamp assay at hP2X3 receptors. Among the novel hP2X3 receptor antagonists, intrathecal treatment of compound 29 showed parallel efficacy with pregabalin (calcium channel modulator) and higher efficacy than AF353 (P2X3 receptor antagonist) in the evaluation of its antiallodynic effects in spinal nerve ligation rats. However, because compound 29 was inactive by intraperitoneal administration in neuropathic pain animal models due to low cell permeability, the corresponding methyl ester analogue, 28, which could be converted to compound 29 in vivo, was investigated as a prodrug concept. Intravenous injection of compound 28 resulted in potent antiallodynic effects, with ED50 values of 2.62 and 2.93 mg/kg in spinal nerve ligation and chemotherapy-induced peripheral neuropathy rats, respectively, indicating that new drug development targeting the P2X3 receptor could be promising for neuropathic pain, a disease with high unmet medical needs.

  11. Oxidation and reduction behaviors of a prototypic MgO-PuO2-x inert matrix fuel

    NASA Astrophysics Data System (ADS)

    Miwa, Shuhei; Osaka, Masahiko

    2017-04-01

    Oxidation and reduction behaviors of prototypic MgO-based inert matrix fuels (IMFs) containing PuO2-x were experimentally investigated by means of thermogravimetry. The oxidation and reduction kinetics of the MgO-PuO2-x specimen were determined. The oxidation and reduction rates of the MgO-PuO2-x were found to be low compared with those of PuO2-x. It is note that the changes in O/Pu ratios of MgO-PuO2-x from stoichiometry were smaller than those of PuO2-x at high oxygen partial pressure.

  12. Inguinal Lymph Node Anthracosis: A Case Report

    PubMed Central

    Soto, Carlos Alberto

    2016-01-01

    Summary: Anthracosis is defined as black, dense pigments in tissues, usually carbon deposits. We, as surgeons, have to make decisions during surgery to the best of our knowledge and based on what the literature provides us. We present the case of a 30-year-old female patient who underwent abdominoplasty. During surgery, bilateral inguinal pigmented and enlarged lymph nodes were seen. Biopsy of the nodes was done to rule out any malignancy. The results showed tattoo pigments on all lymph nodes. We present this case as tattoo pigment migration, which has been rarely described. PMID:27536493

  13. Checkpointing for a hybrid computing node

    DOEpatents

    Cher, Chen-Yong

    2016-03-08

    According to an aspect, a method for checkpointing in a hybrid computing node includes executing a task in a processing accelerator of the hybrid computing node. A checkpoint is created in a local memory of the processing accelerator. The checkpoint includes state data to restart execution of the task in the processing accelerator upon a restart operation. Execution of the task is resumed in the processing accelerator after creating the checkpoint. The state data of the checkpoint are transferred from the processing accelerator to a main processor of the hybrid computing node while the processing accelerator is executing the task.

  14. Angle-resolved photoemission studies on bi-layer colossal magnetoresistive oxides lanthanum(2-2x)strontium(1+2x)manganese(2)oxide(7)

    NASA Astrophysics Data System (ADS)

    Sun, Zhe

    In recent years the studies of manganites have flourished initially because of their Colossal Magnetoresistance (CMR) effect. However the scientific community quickly realized that the fundamental physics is abundant, exotic and challenging. Strong correlations of charge, lattice, spin and orbital degrees of freedom have been found to be responsible for many interesting physical phenomena. Of manganites, La2-2xSr 1+2xMn2O 7 has naturally layered crystal structure. The reduced two-dimensional character amplifies fluctuations of electronic, magnetic, and orbital degrees of freedom and interactions of them, which provides good opportunities for an understanding of the rich physics in manganites. In crystals, electrons have intrinsic charge, spin and orbital degrees of freedom, and the electron-phonon interaction has been an active topic for many decades, thus studies of electrons will definitely shed light on important physics in manganites. Angle-resolved photoemission spectroscopy (ARPES) is an ideal probe of electrons, and so by performing ARPES measurements on La2-2 xSr1+2xMn2 O7 we have obtained abundant knowledge of the physics of strong correlations of various degrees of freedom. We have made many new discoveries by exploring the physics in this com-pound. For the first time we resolved bi-layer split band structure of the prototype of bi-layer manganites, which was predicted by theoretical calculations long time ago. We observed minority-spin states in La2-2 xSr1+2xMn 2O7 (x = 0.36--0.39), which gives direct evidence that this system is not a half-metal in this doping iv range. We gave the first direct measurement of electron-phonon coupling strength in manganites and identified the phonon branches to which electrons couple. In addition to band insulator and Mott insulator there is another type of insulator, in which metallic domains and insulating domains coexist and phase separation and percolation effect play important roles in the metal

  15. Proton and hole conductivity of SrY{sub 2-2x}Ca{sub 2x}O{sub 4-{alpha}} in humid air

    SciTech Connect

    Balakireva, V.B.; Gorelov, V.P.

    1995-05-01

    Previously, the authors studied the electrical conductivity of compounds SrR{sub 2}O{sub 4}(R=Y,Ho-Lu) doped with calcium: SrR{sub 1.98}Ca{sub 0.02}O{sub 4-{alpha}}. In the presence of water vapor, high-temperature ionic transport in these materials was found to be associated with proton mobility. Among the compounds studied, the SrY{sub 2}O{sub 4} ceramic showed the highest ionic conductivity. For this reason, the compounds SrY{sub 2-2x}Ca{sub 2x}O{sub 4-{alpha}} (x=0.01-09.1) were selected for further investigation.

  16. Persistent photoinduced modifications in the phase-separated states of L a2 -2 xS r1 +2 xM n2O7

    NASA Astrophysics Data System (ADS)

    Sun, Kai; Sun, Shuaishuai; Li, Xingyuan; Li, Zhongwen; Zhang, Ruixin; Wei, Linlin; Guo, Cong; Zheng, Dingguo; Tian, Huanfang; Yang, Huaixin; Li, Jianqi

    2016-11-01

    Reentrant charge-ordering transition (RCOT) in the bilayered perovskite manganite L a2 -2 xS r1 +2 xM n2O7 can yield observable changes in both the structural and physical properties associated with phase separation. Our recent measurements show that laser illumination can result in persistent modifications of both the resistance and microstructure in the phase-separated (PS) states. Measurements of photoinduced effects on an x =0.6 sample reveal a persistent increase of the resistance by as much as 40%. Low-temperature laser in situ transmission electron microscope observations clearly show that in situ laser irradiation can modify the PS nature and strengthen the charge-ordered state. We attribute these photoinduced phenomena to the optical modulation of the hole concentration in the Mn O2 layers and the alteration of the local Mn orbital configurations in the PS states.

  17. A solid solution series of atacamite type Ni{sub 2x}Mg{sub 2−2x}Cl(OH){sub 3}

    SciTech Connect

    Bette, Sebastian; Dinnebier, Robert E.; Röder, Christian; Freyer, Daniela

    2015-08-15

    For the first time a complete solid solution series Ni{sub 2x}Mg{sub 2−2x}Cl(OH){sub 3} of an atacamite type alkaline main group metal chloride, Mg{sub 2}Cl(OH){sub 3}, and a transition group metal chloride, Ni{sub 2}Cl(OH){sub 3}, was prepared and characterized by chemical and thermal analysis as well as by Raman and IR spectroscopy, and high resolution laboratory X-ray powder diffraction. All members of the solid solution series crystallize in space group Pnam (62). The main building units of these crystal structures are distorted, edge-linked Ni/MgO{sub 4}Cl{sub 2} and Ni/MgO{sub 5}Cl octahedra. The distribution of Ni{sup 2+}- and Mg{sup 2+}-ions among these two metal-sites within the solid solution series is discussed in detail. The crystallization of the solid solution phases occurs via an intermediate solid solution series, (Ni/Mg)Cl{sub 2x}(OH){sub 2−2x}, with variable Cl: OH ratio up to the 1:3 ratio according to the formula Ni{sub 2x}Mg{sub 2−2x} Cl(OH){sub 3}. For one isolated intermediate solid solution member, Ni{sub 0.70}Mg{sub 0.30}Cl{sub 0.58}(OH){sub 1.42}, the formation and crystal structure is presented as well. - Graphical abstract: For the first time a complete solid solution series, Ni{sub 2x}Mg{sub 2−2x} Cl(OH){sub 3}, was synthesized and characterized. Structure solution by revealed that Ni{sup 2+} prefers to occupy the Jahn–Teller-like distorted hole, out of two available cation sites. Substitution of Ni{sup 2+} by Mg{sup 2+} in atacamite type Ni{sub 2}Cl(OH){sub 3} results in systematic band shifts in Raman and IR spectra as well as in systematic changes in thermal properties. The α-polymorphs M{sub 2}Cl(OH){sub 3} with M=Mg{sup 2+}, Ni{sup 2+} and other divalent transition metal ions, as described in literature, were identified as separate compounds. - Highlights: • First synthesis of solid solution series between main and transition metal chloride. • Ni{sup 2+} prefers to occupy Jahn–Teller-like distorted octahedral holes

  18. Electronic structure and thermoelectric properties of (Mg2X)2 / (Mg2Y)2 (X, Y = Si, Ge, Sn) superlattices from first-principle calculations

    NASA Astrophysics Data System (ADS)

    Guo, San-Dong

    2016-05-01

    To identify thermoelectric materials containing abundant, low-cost and non-toxic elements, we have studied the electronic structures and thermoelectric properties of (Mg2X)2/ (Mg2Y)2 (X, Y = Si, Ge, Sn) superlattices with state-of-the-art first-principles calculations using a modified Becke and Johnson (mBJ) exchange potential. Our results show that (Mg2Ge)2/ (Mg2Sn)2 and (Mg2Si)2/ (Mg2Sn)2 are semi-metals using mBJ plus spin-orbit coupling (mBJ + SOC), while (Mg2Si)2/ (Mg2Ge)2 is predicted to be a direct-gap semiconductor with a mBJ gap value of 0.46 eV and mBJ + SOC gap value of 0.44 eV. Thermoelectric properties are predicted by through solving the Boltzmann transport equations within the constant scattering time approximation. It is found that (Mg2Si)2/ (Mg2Ge)2 has a larger Seebeck coefficient and power factor than (Mg2Ge)2/ (Mg2Sn)2 and (Mg2Si)2/ (Mg2Sn)2 for both p-type and n-type doping. The detrimental influence of SOC on the power factor of p-type (Mg2X)2/ (Mg2Y)2 (X, Y = Si, Ge, Sn) is analyzed as a function of the carrier concentration, but there is a negligible SOC effect for n-type. These results can be explained by the influence of SOC on their valence and conduction bands near the Fermi level.

  19. Mn2- x Y x (MoO4)3 Phosphor Excited by UV GaN-Based Light-Emitting Diode for White Emission

    NASA Astrophysics Data System (ADS)

    Chen, Lung-Chien; Tseng, Zong-Liang; Hsu, Ting-Chun; Yang, Shengyi; Chen, Yuan-Bin

    2017-04-01

    One option for low-cost white light-emitting diodes (LEDs) is the combination of a near-ultraviolet (UV) LED chip (382 nm) and a single phosphor. Such Mn2- x Y x (MoO4)3 single phosphors have been fabricated by a simple solid-state reaction route and their emission color tuned by controlling the Mn doping amount. The chromaticity coordinates of the white light emitted by the UV GaN LED with the MnY(MoO4)3 phosphor were x = 0.5204 and y = 0.4050 [correlated color temperature (CCT) = 7958 K].

  20. Optimization of MSB for future technology nodes

    NASA Astrophysics Data System (ADS)

    Doering, Hans-Joachim; Elster, Thomas; Klein, Matthias; Heinitz, Joachim; Schneider, Marc; Weidenmüller, Ulf; Slodowski, Matthias; Stolberg, Ines A.; Dorl, Wolfgang

    2012-03-01

    In the ITRS roadmap [1] increasingly long mask write and cycle time is explicitly addressed as a difficult challenge in mask fabrication for the 16nm technology node and beyond. Write time reduction demands have to be seen in relation to corresponding performance parameters like Line Width Roughness (LWR), resolution, placement as well as CD Uniformity. The previously presented Multi Shaped Beam (MSB) approach [2, 3] is considered a potential solution for high throughput mask write application. In order to fully adapt the MSB concept to future industry's requirements specific optimizations are planned. The key element for achieving write time reduction is a higher probe current at the target, which can be obtained by increasing the number of beamlets as well as applying a higher current density. In the present paper the approach of a 256 beamlet MSB design will be discussed. For a given image field size along with a beamlet number increase both beamlet pitch and size have to be optimized. Out of previous investigations, one finding was that by changing the demagnification after the beam forming section of the MSB column the overall performance can be optimized. Based on first electron-optical simulations for a new final lens a larger demagnification turned out to be advantageous. Stochastic beam blur simulation results for the MSB reduction optics will be presented. During the exposure of a pattern layout the number of used beams, their shape and their distribution within the image field varies, which can lead to space charge distortion effects. In regard to this MSB simulation results obtained for an image field of approximately 10x10ìm² will be presented. For the 256 beamlet MSB design and resist sensitivities of 20μC/cm2, 40μC/cm2 and 100μC/cm2 write time and LWR simulations have been performed. For MSB pattern data fracturing an optimized algorithm has been used, which increased the beamlet utilization factor (indicates the mean number of beamlets which

  1. Surgery and sentinel lymph node biopsy.

    PubMed

    Faries, Mark B; Morton, Donald L

    2007-12-01

    In patients with melanoma, surgery is pivotal not only for the primary tumor but also for regional and often distant metastases. The minimally invasive technique of sentinel node (SN) biopsy has become standard for detection of occult regional node metastasis in patients with intermediate-thickness primary melanoma; in these patients it has a central role in determining prognosis and a significant impact on survival when biopsy results are positive. Its role in thin melanoma remains under evaluation. The regional tumor-draining SN also is a useful model for studies of melanoma-induced immunosuppression. Although completion lymphadenectomy remains the standard of care for patients with SN metastasis, results of ongoing phase III trials will indicate whether SN biopsy without further lymph node surgery is adequate therapy for certain patients with minimal regional node disease.

  2. Percutaneous Vertebroplasty in Painful Schmorl Nodes

    SciTech Connect

    Masala, Salvatore Pipitone, Vincenzo; Tomassini, Marco; Massari, Francesco; Romagnoli, Andrea; Simonetti, Giovanni

    2006-02-15

    The Schmorl node represents displacement of intervertebral disc tissue into the vertebral body. Both Schmorl nodes and degenerative disc disease are common in the human spine. We performed a retrospective study, for the period from January 2003 to February 2005, evaluating 23 patients affected by painful Schmorl nodes, who underwent in our department percutaneous transpedicular injection of polymethylmethacrylate (vertebroplasty) in order to solve their back pain not responsive to medical and physical management. Eighteen patients reported improvement of the back pain and no one reported a worsening of symptoms. Improvement was swift and persistent in reducing symptoms. Painful Schmorl nodes, refractory to medical or physical therapy, should be considered as a new indication within those vertebral lesions adequately treatable utilizing Vertebroplasty procedure.

  3. The SEMATECH Berkeley MET pushing EUV development beyond 22nm half pitch

    NASA Astrophysics Data System (ADS)

    Naulleau, Patrick; Anderson, Christopher N.; Baclea-an, Lorie-Mae; Chan, David; Denham, Paul; George, Simi; Goldberg, Kenneth A.; Hoef, Brian; Jones, Gideon; Koh, Chawon; La Fontaine, Bruno; McClinton, Brittany; Miyakawa, Ryan; Montgomery, Warren; Rekawa, Seno; Wallow, Tom

    2010-04-01

    Microfield exposure tools (METs) play a crucial role in the development of extreme ultraviolet (EUV) resists and masks. One of these tools is the SEMATECH Berkeley 0.3 numerical aperture (NA) MET. Using conventional illumination this tool is limited to approximately 22-nm half pitch resolution. However, resolution enhancement techniques have been used to push the patterning capabilities of this tool to half pitches of 18 nm and below. This resolution was achieved in a new imageable hardmask which also supports contact printing down to 22 nm with conventional illumination. Along with resolution, line-edge roughness is another crucial hurdle facing EUV resists. Much of the resist LER, however, can be attributed to the mask. We have shown that intenssionally aggressive mask cleaning on an older generation mask causes correlated LER in photoresist to increase from 3.4 nm to 4.0 nm. We have also shown that new generation EUV masks (100 pm of substrate roughness) can achieve correlated LER values of 1.1 nm, a 3× improvement over the correlated LER of older generation EUV masks (230 pm of substrate roughness). Finally, a 0.5-NA MET has been proposed that will address the needs of EUV development at the 16-nm node and beyond. The tool will support an ultimate resolution of 8 nm half-pitch and generalized printing using conventional illumination down to 12 nm half pitch.

  4. The SEMATECH Berkeley MET pushing EUV development beyond 22-nm half pitch

    SciTech Connect

    Naulleau, P.; Anderson, C. N.; Backlea-an, L.-M.; Chan, D.; Denham, P.; George, S.; Goldberg, K. A.; Hoef, B.; Jones, G.; Koh, C.; La Fontaine, B.; McClinton, B.; Miyakawa, R.; Montgomery, W.; Rekawa, S.; Wallow, T.

    2010-03-18

    Microfield exposure tools (METs) play a crucial role in the development of extreme ultraviolet (EUV) resists and masks, One of these tools is the SEMATECH Berkeley 0.3 numerical aperture (NA) MET, Using conventional illumination this tool is limited to approximately 22-nm half pitch resolution. However, resolution enhancement techniques have been used to push the patterning capabilities of this tool to half pitches of 18 nm and below, This resolution was achieved in a new imageable hard mask which also supports contact printing down to 22 nm with conventional illumination. Along with resolution, line-edge roughness is another crucial hurdle facing EUV resists, Much of the resist LER, however, can be attributed to the mask. We have shown that intenssionally aggressive mask cleaning on an older generation mask causes correlated LER in photoresist to increase from 3.4 nm to 4,0 nm, We have also shown that new generation EUV masks (100 pm of substrate roughness) can achieve correlated LER values of 1.1 nm, a 3x improvement over the correlated LER of older generation EUV masks (230 pm of substrate roughness), Finally, a 0.5-NA MET has been proposed that will address the needs of EUV development at the 16-nm node and beyond, The tool will support an ultimate resolution of 8 nm half-pitch and generalized printing using conventional illumination down to 12 nm half pitch.

  5. Bolometric properties of reactively sputtered TiO2-x films for thermal infrared image sensors

    NASA Astrophysics Data System (ADS)

    Reddy, Y. Ashok Kumar; Kang, In-Ku; Shin, Young Bong; Lee, Hee Chul

    2015-09-01

    A heat-sensitive layer (TiO2-x ) was successfully deposited by RF reactive magnetron sputtering for infrared (IR) image sensors at different relative mass flow of oxygen gas (R O2) levels. The deposition rate was decreased with an increase in the percentage of R O2 from 3.4% to 3.7%. TiO2-x samples deposited at room temperature exhibited amorphous characteristics. Oxygen deficiency causes a change in the oxidation state and is assumed to decrease the Ti4+ component on the surfaces of TiO2-x films. The oxygen stoichiometry (x) in TiO2-x films decreased from 0.35 to 0.05 with increasing the R O2 level from 3.4% to 3.7%, respectively. In TiO2-x -test-patterned samples, the resistivity decreased with the temperature, confirming the typical semiconducting property. The bolometric properties of the resistivity, temperature coefficient of resistance (TCR), and the flicker (1/ f) noise parameter were determined at different x values in TiO2-x samples. The rate of TCR dependency with regard to the 1/ f noise parameter is a universal bolometric parameter (β), acting as the dynamic element in a bolometer. It is high when a sample has a relatively low resistivity (0.82 Ω·cm) and a lower 1/ f noise parameter (3.16   ×   10-12). The results of this study indicate that reactively sputtered TiO2-x is a viable bolometric material for uncooled IR image sensor devices.

  6. Ion access pathway to the transmembrane pore in P2X receptor channels

    PubMed Central

    Robertson, Janice L.; Li, Mufeng; Silberberg, Shai D.

    2011-01-01

    P2X receptors are trimeric cation channels that open in response to the binding of adenosine triphosphate (ATP) to a large extracellular domain. The x-ray structure of the P2X4 receptor from zebrafish (zfP2X4) receptor reveals that the extracellular vestibule above the gate opens to the outside through lateral fenestrations, providing a potential pathway for ions to enter and exit the pore. The extracellular region also contains a void at the central axis, providing a second potential pathway. To investigate the energetics of each potential ion permeation pathway, we calculated the electrostatic free energy by solving the Poisson-Boltzmann equation along each of these pathways in the zfP2X4 crystal structure and a homology model of rat P2X2 (rP2X2). We found that the lateral fenestrations are energetically favorable for monovalent cations even in the closed-state structure, whereas the central pathway presents strong electrostatic barriers that would require structural rearrangements to allow for ion accessibility. To probe ion accessibility along these pathways in the rP2X2 receptor, we investigated the modification of introduced Cys residues by methanethiosulfonate (MTS) reagents and constrained structural changes by introducing disulfide bridges. Our results show that MTS reagents can permeate the lateral fenestrations, and that these become larger after ATP binding. Although relatively small MTS reagents can access residues in one of the vestibules within the central pathway, no reactive positions were identified in the upper region of this pathway, and disulfide bridges that constrain movements in that region do not prevent ion conduction. Collectively, these results suggest that ions access the pore using the lateral fenestrations, and that these breathe as the channel opens. The accessibility of ions to one of the chambers in the central pathway likely serves a regulatory function. PMID:21624948

  7. The planarian P2X homolog in the regulation of asexual reproduction.

    PubMed

    Sakurai, Toshihide; Lee, Hayoung; Kashima, Makoto; Saito, Yumi; Hayashi, Tetsutaro; Kudome-Takamatsu, Tomomi; Nishimura, Osamu; Agata, Kiyokazu; Shibata, Norito

    2012-01-01

    The growth in size of freshwater planarians in response to nutrient intake is limited by the eventual separation of tail and body fragments in a process called fission. The resulting tail fragment regenerates the entire body as an artificially amputated tail fragment would do, and the body fragment regenerates a tail, resulting in two whole planarians. This regenerative ability is supported by pluripotent somatic stem cells, called neoblasts, which are distributed throughout almost the entire body of the planarian. Neoblasts are the only planarian cells with the ability to continuously proliferate and give rise to all types of cells during regeneration, asexual reproduction, homeostasis, and growth. In order to investigate the molecular characteristics of neoblasts, we conducted an extensive search for neoblast-specific genes using the High Coverage Expression Profiling (HiCEP) method, and tested the function of the resulting candidates by RNAi. Disruption of the expression of one candidate gene, DjP2X-A (Dugesia japonica membrane protein P2X homologue), resulted in a unique phenotype. DjP2X-A RNAi leads to an increase of fission events upon feeding. We confirmed by immunohistochemistry that DjP2X-A is a membrane protein, and elucidated its role in regulating neoblast proliferation, thereby explaining its unique phenotype. We found that DjP2X-A decreases the burst of neoblast proliferation that normally occurs after feeding. We also found that DjP2X-A is required for normal proliferation in starved animals. We propose that DjP2X-A modulates stem cell proliferation in response to the nutritional condition.

  8. P2X7 receptor inhibition protects against ischemic acute kidney injury in mice.

    PubMed

    Yan, Yanli; Bai, Jianwen; Zhou, Xiaoxu; Tang, Jinhua; Jiang, Chunming; Tolbert, Evelyn; Bayliss, George; Gong, Rujun; Zhao, Ting C; Zhuang, Shougang

    2015-03-15

    Activation of the purinergic P2X7 receptor (P2X7R) has been associated with the development of experimental nephritis and diabetic and hypertensive nephropathy. However, its role in acute kidney injury (AKI) remains unknown. In this study, we examined the effects of P2X7R inhibition in a murine model of ischemia-reperfusion (I/R)-induced AKI using A438079, a selective inhibitor of P2X7R. At 24 h after I/R, mice developed renal dysfunction and renal tubular damage, which was accompanied by elevated expression of P2X7R. Early administration of A438079 immediately or 6 h after the onset of reperfusion protected against renal dysfunction and attenuated kidney damage whereas delayed administration of A438079 at 24 h after restoration of perfusion had no protective effects. The protective actions of A438079 were associated with inhibition of renal tubule injury and cell death and suppression of renal expression of monocyte chemotactic protein-1 and regulated upon expression normal T cell expressed and secreted (RANTES). Moreover, I/R injury led to an increase in phosphorylation (activation) of extracellular signal-regulated kinases 1/2 in the kidney; treatment with A438079 diminished this response. Collectively, these results indicate that early P2X7R inhibition is effective against renal tubule injury and proinflammatory response after I/R injury and suggest that targeting P2X7R may be a promising therapeutic strategy for treatment of AKI.

  9. Primitive ATP-activated P2X receptors: discovery, function and pharmacology

    PubMed Central

    Fountain, Samuel J.

    2013-01-01

    Adenosine 5-triphosphate (ATP) is omnipresent in biology. It is therefore no surprise that organisms have evolved multifaceted roles for ATP, exploiting its abundance and restriction of passive diffusion across biological membranes. A striking role is the emergence of ATP as a bona fide transmitter molecule, whereby the movement of ATP across membranes serves as a chemical message through a direct ligand-receptor interaction. P2X receptors are ligand-gated ion channels that mediate fast responses to the transmitter ATP in mammalian cells including central and sensory neurons, vascular smooth muscle, endothelium, and leukocytes. Molecular cloning of P2X receptors and our understanding of structure-function relationships has provided sequence information with which to query an exponentially expanding wealth of genome sequence information including protist, early animal and human pathogen genomes. P2X receptors have now been cloned and characterized from a number of simple organisms. Such work has led to surprising new cellular roles for the P2X receptors family and an unusual phylogeny, with organisms such as Drosophila and C. elegans notably lacking P2X receptors despite retaining ionotropic receptors for other common transmitters that are present in mammals. This review will summarize current work on the evolutionary biology of P2X receptors and ATP as a signaling molecule, discuss what can be drawn from such studies when considering the action of ATP in higher animals and plants, and outline how simple organisms may be exploited experimentally to inform P2X receptor function in a wider context. PMID:24367292

  10. Synchronizing compute node time bases in a parallel computer

    DOEpatents

    Chen, Dong; Faraj, Daniel A; Gooding, Thomas M; Heidelberger, Philip

    2014-12-30

    Synchronizing time bases in a parallel computer that includes compute nodes organized for data communications in a tree network, where one compute node is designated as a root, and, for each compute node: calculating data transmission latency from the root to the compute node; configuring a thread as a pulse waiter; initializing a wakeup unit; and performing a local barrier operation; upon each node completing the local barrier operation, entering, by all compute nodes, a global barrier operation; upon all nodes entering the global barrier operation, sending, to all the compute nodes, a pulse signal; and for each compute node upon receiving the pulse signal: waking, by the wakeup unit, the pulse waiter; setting a time base for the compute node equal to the data transmission latency between the root node and the compute node; and exiting the global barrier operation.

  11. Synchronizing compute node time bases in a parallel computer

    DOEpatents

    Chen, Dong; Faraj, Daniel A; Gooding, Thomas M; Heidelberger, Philip

    2015-01-27

    Synchronizing time bases in a parallel computer that includes compute nodes organized for data communications in a tree network, where one compute node is designated as a root, and, for each compute node: calculating data transmission latency from the root to the compute node; configuring a thread as a pulse waiter; initializing a wakeup unit; and performing a local barrier operation; upon each node completing the local barrier operation, entering, by all compute nodes, a global barrier operation; upon all nodes entering the global barrier operation, sending, to all the compute nodes, a pulse signal; and for each compute node upon receiving the pulse signal: waking, by the wakeup unit, the pulse waiter; setting a time base for the compute node equal to the data transmission latency between the root node and the compute node; and exiting the global barrier operation.

  12. Statins and ATP regulate nuclear pAkt via the P2X7 purinergic receptor in epithelial cells

    SciTech Connect

    Mistafa, Oras; Hoegberg, Johan; Stenius, Ulla

    2008-01-04

    Many studies have documented P2X7 receptor functions in cells of mesenchymal origin. P2X7 is also expressed in epithelial cells and its role in these cells remains largely unknown. Our data indicate that P2X7 regulate nuclear pAkt in epithelial cells. We show that low concentration of atorvastatin, a drug inhibiting HMG-CoA reductase and cholesterol metabolism, or the natural agonist extracellular ATP rapidly decreased the level of insulin-induced phosphorylated Akt in the nucleus. This effect was seen within minutes and was inhibited by P2X7 inhibitors. Experiments employing P2X7 siRNA and HEK293 cells heterologously expressing P2X7 and in vivo experiments further supported an involvement of P2X7. These data indicate that extracellular ATP and statins via the P2X7 receptor modulate insulin-induced Akt signaling in epithelial cells.

  13. International Lunar Network (ILN) Anchor Nodes

    NASA Technical Reports Server (NTRS)

    Cohen, Barbara A.

    2008-01-01

    This slide presentation reviews what we know about the interior and surface of the moon and the need to establish a robotic set of geophysical monitoring stations on the surface of the Moon for the purpose of providing significant scientific value to the exploration of the Moon. The ILN Anchor Nodes will provide the backbone of the network in a way that accomplishes new science and allows other nodes to be flexible contributors to the network.

  14. Synthesis of Embedded Software for Sensor Nodes

    DTIC Science & Technology

    2006-01-01

    the development of the fitness evaluator (i.e., the mapping of candidate solutions into values of the relevant cost function), and of the move... the application input data, and each property stored in a particle’s coordinate. An example of mapping the formatted input to the node representation...sensor nodes for a wireless sensor network application, and appended to the Figure 5: Mapping of

  15. Sentinel Node Biopsy in Early Breast Cancer.

    PubMed

    Basso, Stefano M M; Chiara, Giordano B; Lumachi, Franco

    2016-01-01

    The approach to the axilla is an evolving paradigm, and recognition of the complexity of breast cancer (BC) biology is changing treatment options. The sentinel lymph node biopsy (SLNB) technique is based on the excision and histological examination of the axillary lymph nodes(s), which is assumed to be the first one draining from the primary tumor. SLNB can accurately stage the axilla, and several trials have shown that there are no significant differences in local recurrence and overall survival between patients treated with or without axillary node dissection (ALND) after a negative SLNB. Surgical morbidity was significantly reduced in terms of rates of lymphedema and neuropathy, with reduced hospital stay and better quality of life after the SLNB procedure. ALND can safely be omitted in patients with ≥2 positive nodes who received conservative surgery and radiotherapy, while ALND is still recommended in clinically N1 BCs, in case of ≥3 positive nodes, and when the number of positive nodes would be crucial for the choice of chemotherapy. Micrometastatic disease can be safely managed with SLNB alone, and additional identification of micrometastases with immunohistochemistry does not affect disease-free survival or overall survival. An appropriate management of the axilla is crucial for the outcome of patients with early BC, and SLNB introduction into the clinical practice dramatically changed the surgical treatment, reducing morbidity without decreasing survival. A tailored approach should be suggested in each patient with BC, considering the biology of the tumor rather than nodal involvement.

  16. Cervical lymph node diseases in children

    PubMed Central

    Lang, Stephan; Kansy, Benjamin

    2014-01-01

    The lymph nodes are an essential part of the body’s immune system and as such are affected in many infectious, autoimmune, metabolic and malignant diseases. The cervical lymph nodes are particularly important because they are the first drainage stations for key points of contact with the outside world (mouth/throat/nose/eyes/ears/respiratory system) – a critical aspect especially among children – and can represent an early clinical sign in their exposed position on a child’s slim neck. Involvement of the lymph nodes in multiple conditions is accompanied by a correspondingly large number of available diagnostic procedures. In the interests of time, patient wellbeing and cost, a careful choice of these must be made to permit appropriate treatment. The basis of diagnostic decisions is a detailed anamnesis and clinical examination. Sonography also plays an important role in differential diagnosis of lymph node swelling in children and is useful in answering one of the critical diagnostic questions: is there a suspicion of malignancy? If so, full dissection of the most conspicuous lymph node may be necessary to obtain histological confirmation. Diagnosis and treatment of childhood cervical lymph node disorders present the attending pediatric and ENT physicians with some particular challenges. The spectrum of differential diagnoses and the varying degrees of clinical relevance – from banal infections to malignant diseases – demand a clear and considered approach to the child’s individual clinical presentation. Such an approach is described in the following paper. PMID:25587368

  17. Excitation-induced germanium quantum dot growth on silicon(100)-2X1 by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Er, Ali Oguz

    2011-12-01

    Self-assembled Ge quantum dots (QD) are grown on Si(100)-(2x1) with laser excitation during growth processes by pulsed laser deposition (PLD). In situ reflection-high energy electron diffraction (RHEED) and post-deposition atomic force microscopy (AFM) are used to study the growth dynamics and morphology of the QDs. A Q-switched Nd:YAG laser (lambda = 1064 nm, 40 ns pulse width, 5 J/cm2 fluence, and 10 Hz repetition rate) were used to ablate germanium and irradiate the silicon substrate. Ge QD formation on Si(100)-(2x1) with different substrate temperatures and excitation laser energy densities was studied. The excitation laser reduces the epitaxial growth temperature to 250 °C for a 22 ML film. In addition, applying the excitation laser to the substrate during the growth changes the QD morphology and density and improves the uniformity of quantum dots fabricated at 390 °C. At room temperature, applying the excitation laser during growth decreases the surface roughness although epitaxial growth could not be achieved. We have also studied the surface diffusion coefficient of Ge during pulsed laser deposition of Ge on Si(100)-(2x1) with different excitation laser energy densities. Applying the excitation laser to the substrate during the growth increases the surface diffusion coefficient, changes the QD morphology and density, and improves the size uniformity of the grown quantum dots. To study the effect of high intensity ultralast laser pulses, Ge quantum dots on Si(I00) were grown in an ultrahigh vacuum (UHV) chamber (base pressure ˜7.0x10 -10 Torr) by femtosecond pulsed laser deposition. The results show that excitation laser reduces the epitaxial growth temperature to ˜70 °C. This result could lead to nonthermal method to achieve low temperature epitaxy which limits the redistribution of impurities, reduces intermixing in heteroepitaxy, and restricts the generation of defects by thermal stress. We have ruled out thermal effects and some of the desorption

  18. Signaling completion of a message transfer from an origin compute node to a target compute node

    DOEpatents

    Blocksome, Michael A.; Parker, Jeffrey J.

    2011-05-24

    Signaling completion of a message transfer from an origin node to a target node includes: sending, by an origin DMA engine, an RTS message, the RTS message specifying an application message for transfer to the target node from the origin node; receiving, by the origin DMA engine, a remote get message containing a data descriptor for the message and a completion notification descriptor, the completion notification descriptor specifying a local direct put transfer operation for transferring data locally on the origin node; inserting, by the origin DMA engine in an injection FIFO buffer, the data descriptor followed by the completion notification descriptor; transferring, by the origin DMA engine to the target node, the message in dependence upon the data descriptor; and notifying, by the origin DMA engine, the application that transfer of the message is complete in dependence upon the completion notification descriptor.

  19. Signaling completion of a message transfer from an origin compute node to a target compute node

    DOEpatents

    Blocksome, Michael A.

    2011-02-15

    Signaling completion of a message transfer from an origin node to a target node includes: sending, by an origin DMA engine, an RTS message, the RTS message specifying an application message for transfer to the target node from the origin node; receiving, by the origin DMA engine, a remote get message containing a data descriptor for the message and a completion notification descriptor, the completion notification descriptor specifying a local memory FIFO data transfer operation for transferring data locally on the origin node; inserting, by the origin DMA engine in an injection FIFO buffer, the data descriptor followed by the completion notification descriptor; transferring, by the origin DMA engine to the target node, the message in dependence upon the data descriptor; and notifying, by the origin DMA engine, the application that transfer of the message is complete in dependence upon the completion notification descriptor.

  20. Mechanism of action of species-selective P2X7 receptor antagonists

    PubMed Central

    Michel, Anton D; Ng, Sin-Wei; Roman, Shilina; Clay, William C; Dean, David K; Walter, Daryl S

    2009-01-01

    Background and purpose: AZ11645373 and N-{2-methyl-5-[(1R, 5S)-9-oxa-3,7-diazabicyclo[3.3.1]non-3-ylcarbonyl]phenyl}-2-tricyclo[3.3.1.13,7]dec-1-ylacetamide hydrochloride (compound-22) are recently described P2X7 receptor antagonists. In this study we have further characterized these compounds to determine their mechanism of action and interaction with other species orthologues. Experimental approach: Antagonist effects at recombinant and chimeric P2X7 receptors were assessed by ethidium accumulation and radioligand-binding studies. Key results: AZ11645373 and compound-22 were confirmed as selective non-competitive antagonists of human or rat P2X7 receptors respectively. Both compounds were weak antagonists of the mouse and guinea-pig P2X7 receptors and, for each compound, their potency estimates at human and dog P2X7 receptors were similar. The potency of compound-22 was moderately temperature-dependent while that of AZ11645373 was not. The antagonist effects of both compounds were slowly reversible and were not prevented by decavanadate, suggesting that they were allosteric antagonists. Indeed, the compounds competed for binding sites labelled by an allosteric radio-labelled P2X7 receptor antagonist. The species selectivity of AZ11645373, but not compound-22, was influenced by the nature of the amino acid at position 95 of the P2X7 receptor. N2-(3,4-difluorophenyl)-N1-[2-methyl-5-(1-piperazinylmethyl)phenyl]glycinamide dihydrochloride, a positive allosteric modulator of the rat receptor, reduced the potency of compound-22 at the rat receptor but had little effect on the actions of AZ11645373. Conclusions: AZ11645373 and compound-22 are allosteric antagonists of human and rat P2X7 receptors respectively. The differential interaction of the two compounds with the receptor suggests there may be more than one allosteric regulatory site on the P2X7 receptor at which antagonists can bind and affect receptor function. PMID:19309360

  1. P2X7 receptor activation regulates rapid unconventional export of transglutaminase-2

    PubMed Central

    Adamczyk, Magdalena; Griffiths, Rhiannon; Dewitt, Sharon; Knäuper, Vera; Aeschlimann, Daniel

    2015-01-01

    ABSTRACT Transglutaminases (denoted TG or TGM) are externalized from cells via an unknown unconventional secretory pathway. Here, we show for the first time that purinergic signaling regulates active secretion of TG2 (also known as TGM2), an enzyme with a pivotal role in stabilizing extracellular matrices and modulating cell–matrix interactions in tissue repair. Extracellular ATP promotes TG2 secretion by macrophages, and this can be blocked by a selective antagonist against the purinergic receptor P2X7 (P2X7R, also known as P2RX7). Introduction of functional P2X7R into HEK293 cells is sufficient to confer rapid, regulated TG2 export. By employing pharmacological agents, TG2 release could be separated from P2X7R-mediated microvesicle shedding. Neither Ca2+ signaling alone nor membrane depolarization triggered TG2 secretion, which occurred only upon receptor membrane pore formation and without pannexin channel involvement. A gain-of-function mutation in P2X7R associated with autoimmune disease caused enhanced TG2 externalization from cells, and this correlated with increased pore activity. These results provide a mechanistic explanation for a link between active TG2 secretion and inflammatory responses, and aberrant enhanced TG2 activity in certain autoimmune conditions. PMID:26542019

  2. Atomic-scale recognition of surface structure and intercalation mechanism of Ti3C2X.

    PubMed

    Wang, Xuefeng; Shen, Xi; Gao, Yurui; Wang, Zhaoxiang; Yu, Richeng; Chen, Liquan

    2015-02-25

    MXenes represent a large family of functionalized two-dimensional (2D) transition-metal carbides and carbonitrides. However, most of the understanding on their unique structures and applications stops at the theoretical suggestion and lack of experimental support. Herein, the surface structure and intercalation chemistry of Ti3C2X are clarified at the atomic scale by aberration-corrected scanning transmission electron microscope (STEM) and density functional theory (DFT) calculations. The STEM studies show that the functional groups (e.g., OH(-), F(-), O(-)) and the intercalated sodium (Na) ions prefer to stay on the top sites of the centro-Ti atoms and the C atoms of the Ti3C2 monolayer, respectively. Double Na-atomic layers are found within the Ti3C2X interlayer upon extensive Na intercalation via two-phase transition and solid-solution reactions. In addition, aluminum (Al)-ion intercalation leads to horizontal sliding of the Ti3C2X monolayer. On the basis of these observations, the previous monolayer surface model of Ti3C2X is modified. DFT calculations using the new modeling help to understand more about their physical and chemical properties. These findings enrich the understanding of the MXenes and shed light on future material design and applications. Moreover, the Ti3C2X exhibits prominent rate performance and long-term cycling stability as an anode material for Na-ion batteries.

  3. Synthesis and magnetic characterization of Sr-based Ni{sub 2}X-type hexaferrite

    SciTech Connect

    Kamishima, K. Mashiko, T.; Kakizaki, K.; Sakai, M.; Watanabe, K.; Abe, H.

    2015-10-15

    We have investigated the synthesis conditions, and the magnetic properties of the Sr{sub 2}Ni{sub 2}X-type hexagonal ferrite, Sr{sub 2}Ni{sub 2}Fe{sub 28}O{sub 46}. The Sr{sub 2}Ni{sub 2}X-type hexaferrite was synthesized at 1240{sup ∘}C. The spontaneous magnetization at 5 K was 44.2 μ{sub B}/f.u., suggesting that most of the Ni{sup 2+} ions are at the up-spin octahedral sites in the spinel-structure blocks within the model of a Néel-type collinear ferrimagnetic structure. The Curie temperature of the Sr{sub 2}Ni{sub 2}X-type hexaferrite was estimated to be T{sub C}[Sr{sub 2}Ni{sub 2}X] = 472{sup ∘}C. This is consistent with the difference of the block stacking structures of SrM-type, Sr{sub 2}Ni{sub 2}X-type, SrNi{sub 2}W-type, and nickel spinel ferrites.

  4. Expression of purinergic P2X receptor subtypes 1, 2, 3 and 7 in equine laminitis.

    PubMed

    Zamboulis, Danae E; Senior, Mark; Clegg, Peter D; Milner, Peter I

    2013-11-01

    Tissue sensitisation and chronic pain have been described in chronic-active laminitis in the horse, making treatment of such cases difficult. Purinergic P2X receptors are linked to chronic pain and inflammation. The aim of this study was to examine the expression of purinergic P2X receptor subtypes 1, 2, 3 and 7 in the hoof, palmar digital vessels and nerve, dorsal root ganglia and spinal cord in horses with chronic-active laminitis (n=5) compared to non-laminitic horses (n=5). Immunohistochemical analysis was performed on tissue sections using antibodies against P2X receptor subtypes 1-3 and 7. In horses with laminitis, there was a reduction in the thickness of the tunica media layer of the palmar digital vein as a proportion of the whole vessel diameter (0.48±0.05) compared to the non-laminitic group (0.57±0.04; P=0.02). P2X receptor subtype 3 was expressed in the smooth muscle layer (tunica media) of the palmar digital artery of horses with laminitis, but was absent in horses without laminitis. There was strong expression of P2X receptor subtype 7 in the proliferating, partially keratinised, epidermal cells of the secondary epidermal lamellae in the hooves of horses with laminitis, but no immunopositivity in horses without laminitis.

  5. The J-2X Fuel Turbopump - Turbine Nozzle Low Cycle Fatigue Acceptance Rationale

    NASA Technical Reports Server (NTRS)

    Hawkins, Lakiesha V.; Duke, Gregory C.; Newman, Wesley R.; Reynolds, David C.

    2011-01-01

    The J-2X Fuel Turbopump (FTP) turbine, which drives the pump that feeds hydrogen to the J-2X engine for main combustion, is based on the J-2S design developed in the early 1970 s. Updated materials and manufacturing processes have been incorporated to meet current requirements. This paper addresses an analytical concern that the J-2X Fuel Turbine Nozzle Low Cycle Fatigue (LCF) analysis did not meet safety factor requirements per program structural assessment criteria. High strains in the nozzle airfoil during engine transients were predicted to be caused by thermally induced stresses between the vane hub, vane shroud, and airfoil. The heritage J-2 nozzle was of a similar design and experienced cracks in the same area where analysis predicted cracks in the J-2X design. Redesign options that did not significantly impact the overall turbine configuration were unsuccessful. An approach using component tests and displacement controlled fracture mechanics analysis to evaluate LCF crack initiation and growth rate was developed. The results of this testing and analysis were used to define the level of inspection on development engine test units. The programmatic impact of developing crack initiation/growth rate/arrest data was significant for the J-2X program. Final Design Certification Review acceptance logic will ultimately be developed utilizing this test and analytical data.

  6. Simultaneous three-wavelength continuous wave laser at 946 nm, 1319 nm and 1064 nm in Nd:YAG

    NASA Astrophysics Data System (ADS)

    Lü, Yanfei; Zhao, Lianshui; Zhai, Pei; Xia, Jing; Fu, Xihong; Li, Shutao

    2013-01-01

    A continuous-wave (cw) diode-end-pumped Nd:YAG laser that generates simultaneous laser at the wavelengths 946 nm, 1319 nm and 1064 nm is demonstrated. The optimum oscillation condition for the simultaneous three-wavelength operation has been derived. Using the separation of the three output couplers, we obtained the maximum output powers of 0.24 W at 946 nm, 1.07 W at 1319 nm and 1.88 W at 1064 nm at the absorbed pump power of 11.2 W. A total output power of 3.19 W for the three-wavelength was achieved at the absorbed pump power of 11.2 W with optical conversion efficiency of 28.5%.

  7. Dynamically reassigning a connected node to a block of compute nodes for re-launching a failed job

    DOEpatents

    Budnik, Thomas A [Rochester, MN; Knudson, Brant L [Rochester, MN; Megerian, Mark G [Rochester, MN; Miller, Samuel J [Rochester, MN; Stockdell, William M [Byron, MN

    2012-03-20

    Methods, systems, and products for dynamically reassigning a connected node to a block of compute nodes for re-launching a failed job that include: identifying that a job failed to execute on the block of compute nodes because connectivity failed between a compute node assigned as at least one of the connected nodes for the block of compute nodes and its supporting I/O node; and re-launching the job, including selecting an alternative connected node that is actively coupled for data communications with an active I/O node; and assigning the alternative connected node as the connected node for the block of compute nodes running the re-launched job.

  8. Resolution enhancement techniques for contact hole printing of sub-50nm memory device

    NASA Astrophysics Data System (ADS)

    Shin, Hye-Jin; You, Tae-jun; Yoo, Min-Ae; Choi, Jin-Young; Yang, Kiho; Park, Chan-Ha; Yim, Dong-gyu

    2008-11-01

    In resolution limited lithography process, the contact hole pattern is one of the most challenging features to be printed on wafer. A lot of lithographers struggle to make robust hole patterns under 45nm node, especially if the contact hole patterns are composed of dense array and isolated hole simultaneously. The strong OAI(Off Axis Illumination) such as dipole is very useful technique to enhance resolution for specific features. However the contact hole formed by dipole illumination usually has elliptical shape and the asymmetric feature leads to increment of chip size. In this paper, we will explore the lithographic feasibility for the coexisting dense array with isolated contact holes and the technical issues are investigated to generate finer contact hole for both dense and isolated feature. Conventional illumination with resist shrinkage technique will be used to generate dense array and isolated contact hole maintaining original shape for the sub-50nm node memory device.

  9. APF pitch-halving for 22nm logic cells using gridded design rules

    NASA Astrophysics Data System (ADS)

    Smayling, Michael C.; Bencher, Christopher; Chen, Hao D.; Dai, Huixiong; Duane, Michael P.

    2008-03-01

    The 22nm logic technology node with dimensions of ~32nm will be the first node to require some form of pitch-halving. A unique combination of a Producer APF (R)-based process sequence and GDR-based design style permits implementation of random logic functions with regular layout patterns. The APF (Advanced Patterning Film) pitch-halving approach is a classic Self-Aligned Double Patterning scheme (SADP) [1,2,3,4] which involves the creation of CVD dielectric spacers on an APF sacrificial template and using the spacers as a hardmask for line frequency doubling. The Tela Canva TM implements Gridded Design Rules (GDR) using straight lines placed on a regular grid. Logic functions can be implemented using lines on a half-pitch with gaps at selected locations.

  10. Photoinitiated oxidation of geosmin and 2-methylisoborneol by irradiation with 254 nm and 185 nm UV light.

    PubMed

    Kutschera, Kristin; Börnick, Hilmar; Worch, Eckhard

    2009-05-01

    The degradation of geosmin and 2-methylisoborneol (2-MIB) by UV irradiation at different wavelengths was investigated under varying boundary conditions. The results showed that conventional UV radiation (254 nm) is ineffective in removing these compounds from water. In contrast to the usual UV radiation UV/VUV radiation (254+185 nm) was more effective in the removal of the taste and odour compounds. The degradation could be described by a simple pseudo first-order rate law with rate constants of about 1.2 x 10(-3) m(2)J(-1) for geosmin and 2-MIB in ultrapure water. In natural water used for drinking water abstraction the rate constants decreased to 2.7 x 10(-4) m(2)J(-1) for geosmin and 2.5 x 10(-4) m(2)J(-1) for 2-MIB due to the presence of NOM. Additionally, the formation of the by-product nitrite was studied. In the UV/VUV irradiation process up to 0.6 mg L(-1) nitrite was formed during the complete photoinitiated oxidation of the odour compounds. However, the addition of low ozone doses could prevent the formation of nitrite in the UV/VUV irradiation experiments.

  11. Implementation of Multiple Host Nodes in Wireless Sensing Node Network System for Landslide Monitoring

    NASA Astrophysics Data System (ADS)

    Abas, Faizulsalihin bin; Takayama, Shigeru

    2015-02-01

    This paper proposes multiple host nodes in Wireless Sensing Node Network System (WSNNS) for landslide monitoring. As landslide disasters damage monitoring system easily, one major demand in landslide monitoring is the flexibility and robustness of the system to evaluate the current situation in the monitored area. For various reasons WSNNS can provide an important contribution to reach that aim. In this system, acceleration sensors and GPS are deployed in sensing nodes. Location information by GPS, enable the system to estimate network topology and enable the system to perceive the location in emergency by monitoring the node mode. Acceleration sensors deployment, capacitate this system to detect slow mass movement that can lead to landslide occurrence. Once deployed, sensing nodes self-organize into an autonomous wireless ad hoc network. The measurement parameter data from sensing nodes is transmitted to Host System via host node and "Cloud" System. The implementation of multiple host nodes in Local Sensing Node Network System (LSNNS), improve risk- management of the WSNNS for real-time monitoring of landslide disaster.

  12. Inline detection of Chrome degradation on binary 193nm photomasks

    NASA Astrophysics Data System (ADS)

    Dufaye, Félix; Sippel, Astrid; Wylie, Mark; García-Berríos, Edgardo; Crawford, Charles; Hess, Carl; Sartelli, Luca; Pogliani, Carlo; Miyashita, Hiroyuki; Gough, Stuart; Sundermann, Frank; Brochard, Christophe

    2013-09-01

    193nm binary photomasks are still used in the semiconductor industry for the lithography of some critical layers for the nodes 90nm and 65nm, with high volumes and over long periods. However, these 193nm binary photomasks can be impacted by a phenomenon of chrome oxidation leading to critical dimensions uniformity (CDU) degradation with a pronounced radial signature. If not detected early enough, this CDU degradation may cause defectivity issues and lower yield on wafers. Fortunately, a standard cleaning and repellicle service at the mask shop has been demonstrated as efficient to remove the grown materials and get the photomask CD back on target.Some detection methods have been already described in literature, such as wafer CD intrafield monitoring (ACLV), giving reliable results but also consuming additional SEM time with less precision than direct photomask measurement. In this paper, we propose another approach, by monitoring the CDU directly on the photomask, concurrently with defect inspection for regular requalification to production for wafer fabs. For this study, we focused on a Metal layer in a 90nm technology node. Wafers have been exposed with production conditions and then measured by SEM-CD. Afterwards, this photomask has been measured with a SEM-CD in mask shop and also inspected on a KLA-Tencor X5.2 inspection system, with pixels 125 and 90nm, to evaluate the Intensity based Critical Dimension Uniformity (iCDU) option. iCDU was firstly developed to provide feed-forward CDU maps for scanner intrafield corrections, from arrayed dense structures on memory photomasks. Due to layout complexity and differing feature types, CDU monitoring on logic photomasks used to pose unique challenges.The selection of suitable feature types for CDU monitoring on logic photomasks is no longer an issue, since the transmitted intensity map gives all the needed information, as shown in this paper. In this study, the photomask was heavily degraded after more than 18,000 300

  13. Inspection results for 32nm logic and sub-50nm half-pitch memory reticles using the TeraScanHR

    NASA Astrophysics Data System (ADS)

    Sier, Jean-Paul; Broadbent, William; Mirzaagha, Farzin; Yu, Paul

    2007-10-01

    Results from the recently available TeraScanHR reticle inspection system were published in early 2007. These results showed excellent inspection capability for 45nm logic and 5xnm half-pitch memory advanced production reticles, thus meeting the industry need for the mid-2007 start of production. The system has been in production use since that time. In early 2007, some evidence was shown of capability to inspect reticles for the next nodes, 32nm logic and sub-50nm half-pitch memory, but the results were incomplete due to the limited availability of such reticles. However, more of these advanced reticles have become available since that time. Inspection results of these advanced reticles from various leading edge reticle manufacturers using the TeraScanHR are shown. These results indicate that the system has the capability to provide the needed inspection sensitivity for continued development work to support the industry roadmap.

  14. In depth characterization of electron transport in 14 nm FD-SOI CMOS devices

    NASA Astrophysics Data System (ADS)

    Shin, Minju; Shi, Ming; Mouis, Mireille; Cros, Antoine; Josse, Emmanuel; Kim, Gyu-Tae; Ghibaudo, Gérard

    2015-10-01

    In this paper, carrier transport properties in highly scaled (down to 14 nm-node) FDSOI CMOS devices are presented from 77 K to 300 K. At first, we analyzed electron transport characteristics in terms of different gate-oxide stack in NMOS long devices. So, we found that SOP and RCS can be the dominant contribution of additional mobility scatterings in different temperature regions. Then, electron mobility degradation in short channel devices was deeply investigated. It can be stemmed from additional scattering mechanisms, which were attributed to process-induced defects near source and drain. Finally, we found that mobility enhancement by replacing Si to SiGe channel in PMOS devices was validated and this feature was not effective anymore in sub-100 nm devices. The critical lengths were around 50 nm and 100 nm for NMOS and PMOS devices, respectively.

  15. Stochastic effects in 11 nm imaging of extreme ultraviolet lithography with chemically amplified resists

    NASA Astrophysics Data System (ADS)

    Kozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro

    2014-03-01

    The resolution of extreme ultraviolet (EUV) lithography with chemically amplified resist processes has reached 16 nm (half-pitch). The development of chemically amplified resists is ongoing toward the 11 nm node. However, the stochastic effects are increasingly becoming a significant concern with the continuing shrinkage of features. In this study, the fluctuation of protected unit distribution caused by the stochastic effects during image formation was investigated assuming line-and-space patterns with 11 nm half-pitch. Contrary to expectations, the standard deviation of the number of protected units connected to a polymer after postexposure baking (PEB) did not differ from that for 16 nm half-pitch. The standard deviation after PEB increased with the effective reaction radius for deprotection and the initial standard deviation before PEB. Because of the severe requirements for resist processes, the stochastic effects in chemical reactions should be taken into account in the design of next-generation resists.

  16. High performance nonvolatile memory devices based on Cu2-xSe nanowires

    NASA Astrophysics Data System (ADS)

    Wu, Chun-Yan; Wu, Yi-Liang; Wang, Wen-Jian; Mao, Dun; Yu, Yong-Qiang; Wang, Li; Xu, Jun; Hu, Ji-Gang; Luo, Lin-Bao

    2013-11-01

    We report on the rational synthesis of one-dimensional Cu2-xSe nanowires (NWs) via a solution method. Electrical analysis of Cu2-xSe NWs based memory device exhibits a stable and reproducible bipolar resistive switching behavior with a low set voltage (0.3-0.6 V), which can enable the device to write and erase data efficiently. Remarkably, the memory device has a record conductance switching ratio of 108, much higher than other devices ever reported. At last, a conducting filaments model is introduced to account for the resistive switching behavior. The totality of this study suggests that the Cu2-xSe NWs are promising building blocks for fabricating high-performance and low-consumption nonvolatile memory devices.

  17. Future NTP Development Synergy Leveraged from Current J-2X Engine Development

    NASA Technical Reports Server (NTRS)

    Ballard, Richard O.

    2008-01-01

    This paper is a discussion of how the many long-lead development elements required for the realization of a future nuclear thermal propulsion (NTP) system can be effectively leveraged from the ongoing work being conducted on the J-2X engine program for the Constellation Program. Development studies conducted to date for NTP forward planning have identified a number of technical areas that will require advancement to acceptable technology readiness levels (TRLs) before they can be utilized in NTP system development. These include high-temperature, high-area ratio nozzle extension; long-life, low-NPSP. turbomachinery; and low-boiloff propellant management; and a qualified nuclear fuel element. The current J-2X program is working many of these areas that can be leveraged to support NTP development in a highly compatible and synergistic fashion. In addition to supporting technical development, there are other programmatic issues being worked in the J-2X program that can be leveraged by a future NTP development program. These include compliance with recently-evolved space system requirements such as human-rating, fault tolerance and fracture control. These and other similar mandatory system requirements have been adopted by NASA and can result in a significant technical impact beyond elevation of the root technologies required by NTP. Finally, the exploitation of experience, methodologies, and procedures developed by the J-2X program in the areas of verification, qualification, certification, altitude simulation testing, and facility definition will be especially applicable to a future NTP system. The similarities in system mission (in-space propulsion) and operational environment (vacuum, zero-gee) between J-2X and NTP make this highly synergistic. Thus, it can be $hown that the collective benefit of leveraging experience and technologies developed during the J-2X program can result in significant savings in development cost and schedule for NTP.

  18. Purinergic P2X receptors: structural models and analysis of ligand-target interaction.

    PubMed

    Dal Ben, Diego; Buccioni, Michela; Lambertucci, Catia; Marucci, Gabriella; Thomas, Ajiroghene; Volpini, Rosaria

    2015-01-07

    The purinergic P2X receptors are ligand-gated cation channels activated by the endogenous ligand ATP. They assemble as homo- or heterotrimers from seven cloned subtypes (P2X1-7) and all trimer subunits present a common topology consisting in intracellular N- and C- termini, two transmembrane domains and a large extracellular domain. These membrane proteins are present in virtually all mammalian tissues and regulate a large variety of responses in physio- and pathological conditions. The development of ligands that selectively activate or block specific P2X receptor subtypes hence represents a promising strategy to obtain novel pharmacological tools for the treatment of pain, cancer, inflammation, and neurological, cardiovascular, and endocrine diseases. The publication of the crystal structures of zebrafish P2X4 receptor in inactive and ATP-bound active forms provided structural data for the analysis of the receptor structure, the interpretation of mutagenesis data, and the depiction of ligand binding and receptor activation mechanism. In addition, the availability of ATP-competitive ligands presenting selectivity for P2X receptor subtypes supports the design of new potent and selective ligands with possibly improved pharmacokinetic profiles, with the final aim to obtain new drugs. This study describes molecular modelling studies performed to develop structural models of the human and rat P2X receptors in inactive and active states. These models allowed to analyse the role of some non-conserved residues at ATP binding site and to study the receptor interaction with some non-specific or subtype selective agonists and antagonists.

  19. The P2X7 Receptor Supports Both Life and Death in Fibrogenic Pancreatic Stellate Cells

    PubMed Central

    Haanes, Kristian A.; Schwab, Albrecht; Novak, Ivana

    2012-01-01

    The pancreatic stellate cells (PSCs) have complex roles in pancreas, including tissue repair and fibrosis. PSCs surround ATP releasing exocrine cells, but little is known about purinergic receptors and their function in PSCs. Our aim was to resolve whether PSCs express the multifunctional P2X7 receptor and elucidate how it regulates PSC viability. The number of PSCs isolated from wild type (WT) mice was 50% higher than those from the Pfizer P2X7 receptor knock out (KO) mice. The P2X7 receptor protein and mRNA of all known isoforms were expressed in WT PSCs, while KO PSCs only expressed truncated versions of the receptor. In culture, the proliferation rate of the KO PSCs was significantly lower. Inclusion of apyrase reduced the proliferation rate in both WT and KO PSCs, indicating importance of endogenous ATP. Exogenous ATP had a two-sided effect. Proliferation of both WT and KO cells was stimulated with ATP in a concentration-dependent manner with a maximum effect at 100 µM. At high ATP concentration (5 mM), WT PSCs, but not the KO PSCs died. The intracellular Ca2+ signals and proliferation rate induced by micromolar ATP concentrations were inhibited by the allosteric P2X7 receptor inhibitor az10606120. The P2X7 receptor-pore inhibitor A438079 partially prevented cell death induced by millimolar ATP concentrations. This study shows that ATP and P2X7 receptors are important regulators of PSC proliferation and death, and therefore might be potential targets for treatments of pancreatic fibrosis and cancer. PMID:23284663

  20. Component Testing of the J-2X Augmented Spark Igniter (ASI)

    NASA Technical Reports Server (NTRS)

    Osborne, Robin J.; Peters, Warren T.; Gaspar, Kenny C.; Hauger, Katherine; Kwapisz, Mike J.

    2013-01-01

    In support of the development of the J-2X engine, 201 low pressure, liquid oxygen / liquid hydrogen (LOX/LH2) J-2X Augmented Spark Igniter (ASI) subsystem ignition tests were conducted at Marshall Space Flight Center (MSFC). The main objective of these tests was to start the ASI within the anticipated J-2X engine start box, as well as outside of it, to check for ignition margin. The setup for the J-2X ASI component testing simulated, as much as possible, the tank-head start-up configuration of the ASI within the J-2X Engine. The ignition tests were divided into 124 vacuum start tests to simulate altitude start on a flight engine, and 77 sea-level start tests to simulate the first set of ground tests for the J-2X Engine at Stennis Space Center (SSC). Other ignition parameters that were varied included propellant tank pressures, oxidizer temperature entering the ASI oxidizer feedline, oxidizer valve timing, spark igniter condition (new versus damaged), and oxidizer and fuel feedline orifice sizes. Propellant blowdowns using venturis sized to simulate the ASI resistance allowed calculation of transient propellant mass flow rates as well as global mixture ratio for all ignition tests. Global mixture ratio within the ASI at the time of ignition varied from 0.2 to 1.2. Detailed electronics data obtained from an instrumented ignition lead allowed characterization of the breakdown voltage, sustaining voltage and energy contained in each spark as the ASI propellants ignited. Results indicated that ignition always occurred within the first five sparks when both propellants were present in the ASI chamber.

  1. P2X1 receptor blockade inhibits whole kidney autoregulation of renal blood flow in vivo

    PubMed Central

    Osmond, David A.

    2010-01-01

    In vitro experiments demonstrate that P2X1 receptor activation is important for normal afferent arteriolar autoregulatory behavior, but direct in vivo evidence for this relationship occurring in the whole kidney is unavailable. Experiments were performed to test the hypothesis that P2X1 receptors are important for autoregulation of whole kidney blood flow. Renal blood flow (RBF) was measured in anesthetized male Sprague-Dawley rats before and during P2 receptor blockade with PPADS, P2X1 receptor blockade with IP5I, or A1 receptor blockade with DPCPX. Both P2X1 and A1 receptor stimulation with α,β-methylene ATP and CPA, respectively, caused dose-dependent decreases in RBF. Administration of either PPADS or IP5I significantly blocked P2X1 receptor stimulation. Likewise, administration of DPCPX significantly blocked A1 receptor activation to CPA. Autoregulatory behavior was assessed by measuring RBF responses to reductions in renal perfusion pressure. In vehicle-infused rats, as pressure was decreased from 120 to 100 mmHg, there was no decrease in RBF. However, in either PPADS- or IP5I-infused rats, each decrease in pressure resulted in a significant decrease in RBF, demonstrating loss of autoregulatory ability. In DPCPX-infused rats, reductions in pressure did not cause significant reductions in RBF over the pressure range of 100–120 mmHg, but the autoregulatory curve tended to be steeper than vehicle-infused rats over the range of 80–100 mmHg, suggesting that A1 receptors may influence RBF at lower pressures. These findings are consistent with in vitro data from afferent arterioles and support the hypothesis that P2X1 receptor activation is important for whole kidney autoregulation in vivo. PMID:20335318

  2. P2X7 Receptor Modulates Inflammatory and Functional Pulmonary Changes Induced by Silica

    PubMed Central

    Santana, Patrícia T.; Vieira, Flávia S.; da Graça, Carolyne Lalucha A. L.; Marques-da-Silva, Camila; Machado, Mariana N.; Caruso-Neves, Celso; Zin, Walter A.; Borojevic, Radovan; Coutinho-Silva, Robson

    2014-01-01

    Silicosis is an occupational lung disease, characterized by irreversible and progressive fibrosis. Silica exposure leads to intense lung inflammation, reactive oxygen production, and extracellular ATP (eATP) release by macrophages. The P2X7 purinergic receptor is thought to be an important immunomodulator that responds to eATP in sites of inflammation and tissue damage. The present study investigates the role of P2X7 receptor in a murine model of silicosis. To that end wild-type (C57BL/6) and P2X7 receptor knockout mice received intratracheal injection of saline or silica particles. After 14 days, changes in lung mechanics were determined by the end-inflation occlusion method. Bronchoalveolar lavage and flow cytometry analyzes were performed. Lungs were harvested for histological and immunochemistry analysis of fibers content, inflammatory infiltration, apoptosis, as well as cytokine and oxidative stress expression. Silica particle effects on lung alveolar macrophages and fibroblasts were also evaluated in cell line cultures. Phagocytosis assay was performed in peritoneal macrophages. Silica exposure increased lung mechanical parameters in wild-type but not in P2X7 knockout mice. Inflammatory cell infiltration and collagen deposition in lung parenchyma, apoptosis, TGF-β and NF-κB activation, as well as nitric oxide, reactive oxygen species (ROS) and IL-1β secretion were higher in wild-type than knockout silica-exposed mice. In vitro studies suggested that P2X7 receptor participates in silica particle phagocytosis, IL-1β secretion, as well as reactive oxygen species and nitric oxide production. In conclusion, our data showed a significant role for P2X7 receptor in silica-induced lung changes, modulating lung inflammatory, fibrotic, and functional changes. PMID:25310682

  3. Future NTP Development Synergy Leveraged from Current J-2X Engine Development

    SciTech Connect

    Ballard, Richard O.

    2008-01-21

    This paper is a discussion of how the many long-lead development elements required for the realization of a future nuclear thermal propulsion (NTP) system can be effectively leveraged from the ongoing work being conducted on the J-2X engine program for the Constellation Program. Development studies conducted to date for NTP forward planning have identified a number of technical areas that will require advancement to acceptable technology readiness levels (TRLs) before they can be utilized in NTP system development. These include high-temperature, high-area ratio nozzle extension; long-life, low-NPSP turbomachinery; and low-boiloff propellant management, and a qualified nuclear fuel element. The current J-2X program is working many of these areas that can be leveraged to support NTP development in a highly compatible and synergistic fashion. In addition to supporting technical development, there are other programmatic issues being worked in the J-2X program that can be leveraged by a future NTP development program. These include compliance with recently-evolved space system requirements such as human-rating, fault tolerance and fracture control. These and other similar mandatory system requirements have been adopted by NASA and can result in a significant technical impact beyond elevation of the root technologies required by NTP. Finally, the exploitation of experience, methodologies, and procedures developed by the J-2X program in the areas of verification, qualification, certification, altitude simulation testing, and facility definition will be especially applicable to a future NTP system. The similarities in system mission (in-space propulsion) and operational environment (vacuum, zero-gee) between J-2X and NTP make this highly synergistic. Thus, it can be shown that the collective benefit of leveraging experience and technologies developed during the J-2X program can result in significant savings in development cost and schedule for NTP.

  4. Future NTP Development Synergy Leveraged from Current J-2X Engine Development

    NASA Astrophysics Data System (ADS)

    Ballard, Richard O.

    2008-01-01

    This paper is a discussion of how the many long-lead development elements required for the realization of a future nuclear thermal propulsion (NTP) system can be effectively leveraged from the ongoing work being conducted on the J-2X engine program for the Constellation Program. Development studies conducted to date for NTP forward planning have identified a number of technical areas that will require advancement to acceptable technology readiness levels (TRLs) before they can be utilized in NTP system development. These include high-temperature, high-area ratio nozzle extension; long-life, low-NPSP turbomachinery; and low-boiloff propellant management, and a qualified nuclear fuel element. The current J-2X program is working many of these areas that can be leveraged to support NTP development in a highly compatible and synergistic fashion. In addition to supporting technical development, there are other programmatic issues being worked in the J-2X program that can be leveraged by a future NTP development program. These include compliance with recently-evolved space system requirements such as human-rating, fault tolerance and fracture control. These and other similar mandatory system requirements have been adopted by NASA and can result in a significant technical impact beyond elevation of the root technologies required by NTP. Finally, the exploitation of experience, methodologies, and procedures developed by the J-2X program in the areas of verification, qualification, certification, altitude simulation testing, and facility definition will be especially applicable to a future NTP system. The similarities in system mission (in-space propulsion) and operational environment (vacuum, zero-gee) between J-2X and NTP make this highly synergistic. Thus, it can be shown that the collective benefit of leveraging experience and technologies developed during the J-2X program can result in significant savings in development cost and schedule for NTP.

  5. Raman spectroscopy as a tool for the identification and differentiation of neoplasias contained within lymph nodes of the head and neck

    NASA Astrophysics Data System (ADS)

    Orr, Linda E.; Christie-Brown, Jonathan; Hutchings, Joanne C.; McCarthy, Keith; Rose, Simon; Thomas, Michael; Stone, Nicholas

    2010-02-01

    The use of Raman spectroscopy in the detection and classification of malignancy within lymph nodes of the head and neck has been evaluated. Currently histopathology is considered the diagnostic gold standard. A consensus (majority) opinion from three expert histopathologists has been obtained and spectral diagnostic models developed by correlation with their opinions. Raman spectra have been measured at 830nm from 103 lymph nodes collected from patients undergoing surgery for a suspicious node. The pathologies covered reactive lymph nodes, primaries from Hodgkin's and non-Hodgkin's lymphomas and metastases from squamous cell carcinomas and adenocarcinomas. Spectral diagnostic models were constructed using PCA-fed-LDA and tested using leave-one-specimen-out cross validation. Models were constructed to distinguish between reactive and malignant nodes as well as a four group model to distinguish between the benign, metastatic and primary conditions. They achieved 89% and 84% correct prediction by node versus the gold standard, majority histopathology.

  6. New antireflective coatings for 193-nm lithography

    NASA Astrophysics Data System (ADS)

    Xu, Gu; Guerrero, Douglas J.; Dobson, Norman

    1998-06-01

    New bottom antireflective coatings (BARCs) for 193 nm lithography have been recently developed by Brewer Science Inc. Copolymers of benzyl methacrylate (or benzyl acrylate) and hydroxypropyl methacrylate have been synthesized and used as a main component in 193 nm BARCs. The acrylic copolymers have strong absorbance at 193 nm UV light wavelength. The 193 nm BARCs were formulated in safe solvents such as ethyl lactate and formed by spin-on coating process. Thermosetting of the 193 nm BARCs limited their intermixing with photoresists. These 193 nm BARCs had optical density of about 10 micrometers -1, k equals 0.35, and n equals 1.81. Preliminary oxygen plasma etch rates were > 1.5 times DUV resists. Good profiles at small feature sizes (< 0.20 micrometers ) were achieved with tested photoresists.

  7. The role of P2X3 receptors in bilateral masseter muscle allodynia in rats

    PubMed Central

    Tariba Knežević, Petra; Vukman, Robert; Antonić, Robert; Kovač, Zoran; Uhač, Ivone; Simonić-Kocijan, Sunčana

    2016-01-01

    Aim To determine the relationship between bilateral allodynia induced by masseter muscle inflammation and P2X3 receptor expression changes in trigeminal ganglia (TRG) and the influence of intramasseteric P2X3 antagonist administration on bilateral masseter allodynia. Methods To induce bilateral allodynia, rats received a unilateral injection of complete Freund’s adjuvant (CFA) into the masseter muscle. Bilateral head withdrawal threshold (HWT) was measured 4 days later. Behavioral measurements were followed by bilateral masseter muscle and TRG dissection. Masseter tissue was evaluated histopathologically and TRG tissue was analyzed for P2X3 receptor mRNA expression by using quantitative real-time polymerase chain reaction (PCR) analysis. To assess the P2X3 receptor involvement in nocifensive behavior, two doses (6 and 60 μg/50 μL) of selective P2X3 antagonist A-317491 were administrated into the inflamed masseter muscle 4 days after the CFA injection. Bilateral HWT was measured at 15-, 30-, 60-, and 120-minute time points after A-317491 administration. Results HWT was bilaterally reduced after the CFA injection (P < 0.001). Intramasseteric inflammation was confirmed ipsilaterally to the CFA injection. Quantitative real-time PCR analysis demonstrated enhanced P2X3 expression in TRG ipsilaterally to CFA administration (P < 0.01). In comparison with controls, the dose of 6 μg of A-317491 significantly increased bilateral HWT at 15-, 30-, and 60-minute time points after the A-317491 administration (P < 0.001), whereas the dose of 60 μg of A-317491 was efficient at all time points ipsilaterally (P = 0.004) and at 15-, 30-, and 60-minute time points contralaterally (P < 0.001). Conclusion Unilateral masseter inflammation can induce bilateral allodynia in rats. The study provided evidence that P2X3 receptors can functionally influence masseter muscle allodynia and suggested that P2X3 receptors expressed in TRG neurons are involved in masseter

  8. P2X antagonists inhibit styryl dye entry into hair cells.

    PubMed

    Crumling, M A; Tong, M; Aschenbach, K L; Liu, L Qian; Pipitone, C M; Duncan, R K

    2009-07-21

    The styryl pyridinium dyes, FM1-43 and AM1-43, are fluorescent molecules that can permeate the mechanotransduction channels of hair cells, the sensory receptors of the inner ear. When these dyes are applied to hair cells, they enter the cytoplasm rapidly, resulting in a readily detectable intracellular fluorescence that is often used as a molecular indication of mechanotransduction channel activity. However, such dyes can also permeate the ATP receptor, P2X(2). Therefore, we explored the contribution of P2X receptors to the loading of hair cells with AM1-43. The chick inner ear was found to express P2X receptors and to release ATP, similar to the inner ear of mammals, allowing for the endogenous stimulation of P2X receptors. The involvement of these receptors was evaluated pharmacologically, by exposing the sensory epithelium of the chick inner ear to 5 microM AM1-43 under different experimental conditions and measuring the fluorescence in hair cells after fixation of the tissue. Pre-exposure of the tissue to 5 mM EGTA for 15 min, which should eliminate most of the gating "tip links" of the mechanotransduction channels, deceased fluorescence by only 44%. In contrast, P2X receptor antagonists (pyridoxalphosphate-6-azophenyl-2',4'-disulfonic acid [PPADS], suramin, 2',3'-O-(2,4,6-trinitrophenyl) ATP [TNP-ATP], and d-tubocurarine) had greater effects on dye loading. PPADS, suramin, and TNP-ATP all decreased intracellular AM1-43 fluorescence in hair cells by at least 69% when applied at a concentration of 100 microM. The difference between d-tubocurarine-treated and control fluorescence was statistically insignificant when d-tubocurarine was applied at a concentration that blocks the mechanotransduction channel (200 microM). At a concentration that also blocks P2X(2) receptors (2 mM), d-tubocurarine decreased dye loading by 72%. From these experiments, it appears that AM1-43 can enter hair cells through endogenously activated P2X receptors. Thus, the contribution of P2X

  9. Planning for Plume Diagnostics for Ground Testing of J-2X Engines at the SSC

    NASA Technical Reports Server (NTRS)

    SaintCyr, William W.; Tejwani, Gopal D.; McVay, Gregory P.; Langford, Lester A.; SaintCyr, William W.

    2010-01-01

    John C. Stennis Space Center (SSC) is the premier test facility for liquid rocket engine development and certification for the National Aeronautics and Space Administration (NASA). Therefore, it is no surprise that the SSC will play the most prominent role in the engine development testing and certification for the J-2X engine. The Pratt & Whitney Rocketdyne J-2X engine has been selected by the Constellation Program to power the Ares I Upper Stage Element and the Ares V Earth Departure Stage in NASA s strategy of risk mitigation for hardware development by building on the Apollo program and other lessons learned to deliver a human-rated engine that is on an aggressive development schedule, with first demonstration flight in 2010 and human test flights in 2012. Accordingly, J-2X engine design, development, test, and evaluation is to build upon heritage hardware and apply valuable experience gained from past development and testing efforts. In order to leverage SSC s successful and innovative expertise in the plume diagnostics for the space shuttle main engine (SSME) health monitoring,1-10 this paper will present a blueprint for plume diagnostics for various proposed ground testing activities for J-2X at SSC. Complete description of the SSC s test facilities, supporting infrastructure, and test facilities is available in Ref. 11. The A-1 Test Stand is currently being prepared for testing the J-2X engine at sea level conditions. The A-2 Test Stand is currently being used for testing the SSME and may also be used for testing the J-2X engine at sea level conditions in the future. Very recently, ground-breaking ceremony for the new A-3 rocket engine test stand took place at SSC on August 23, 2007. A-3 is the first large - scale test stand to be built at the SSC since the A and B stands were constructed in the 1960s. The A-3 Test Stand will be used for testing J-2X engines under vacuum conditions simulating high altitude operation at approximately 30,480 m (100,000 ft

  10. P2X7 receptors at adult neural progenitor cells of the mouse subventricular zone.

    PubMed

    Messemer, Nanette; Kunert, Christin; Grohmann, Marcus; Sobottka, Helga; Nieber, Karen; Zimmermann, Herbert; Franke, Heike; Nörenberg, Wolfgang; Straub, Isabelle; Schaefer, Michael; Riedel, Thomas; Illes, Peter; Rubini, Patrizia

    2013-10-01

    Neurogenesis requires the balance between the proliferation of newly formed progenitor cells and subsequent death of surplus cells. RT-PCR and immunocytochemistry demonstrated the presence of P2X7 receptor mRNA and immunoreactivity in cultured neural progenitor cells (NPCs) prepared from the adult mouse subventricular zone (SVZ). Whole-cell patch-clamp recordings showed a marked potentiation of the inward current responses both to ATP and the prototypic P2X7 receptor agonist dibenzoyl-ATP (Bz-ATP) at low Ca(2+) and zero Mg(2+) concentrations in the bath medium. The Bz-ATP-induced currents reversed their polarity near 0 mV; in NPCs prepared from P2X7(-/-) mice, Bz-ATP failed to elicit membrane currents. The general P2X/P2Y receptor antagonist PPADS and the P2X7 selective antagonists Brilliant Blue G and A-438079 strongly depressed the effect of Bz-ATP. Long-lasting application of Bz-ATP induced an initial current, which slowly increased to a steady-state response. In combination with the determination of YO-PRO uptake, these experiments suggest the dilation of a receptor-channel and/or the recruitment of a dye-uptake pathway. Ca(2+)-imaging by means of Fura-2 revealed that in a Mg(2+)-deficient bath medium Bz-ATP causes [Ca(2+)](i) transients fully depending on the presence of external Ca(2+). The MTT test indicated a concentration-dependent decrease in cell viability by Bz-ATP treatment. Correspondingly, Bz-ATP led to an increase in active caspase 3 immunoreactivity, indicating a P2X7-controlled apoptosis. In acute SVZ brain slices of transgenic Tg(nestin/EGFP) mice, patch-clamp recordings identified P2X7 receptors at NPCs with pharmacological properties identical to those of their cultured counterparts. We suggest that the apoptotic/necrotic P2X7 receptors at NPCs may be of particular relevance during pathological conditions which lead to increased ATP release and thus could counterbalance the ensuing excessive cell proliferation.

  11. Arm lymphoscintigraphy after axillary lymph node dissection or sentinel lymph node biopsy in breast cancer

    PubMed Central

    Sarri, Almir José; Dias, Rogério; Laurienzo, Carla Elaine; Gonçalves, Mônica Carboni Pereira; Dias, Daniel Spadoto; Moriguchi, Sonia Marta

    2017-01-01

    Purpose Compare the lymphatic flow in the arm after breast cancer surgery and axillary lymph node dissection (ALND) versus sentinel lymph node biopsy (SLNB) using lymphos-cintigraphy (LS). Patients and methods A cross-sectional study with 39 women >18 years who underwent surgical treatment for unilateral breast cancer and manipulation of the axillary lymph node chain through either ALND or SLNB, with subsequent comparison of the lymphatic flow of the arm by LS. The variables analyzed were the area reached by the lymphatic flow in the upper limb and the sites and number of lymph nodes identified in the ALND or SLNB groups visualized in the three phases of LS acquisition (immediate dynamic and static images, delayed scan images). For all analyses, the level of significance was set at 5%. Results There was a significant difference between the ALND and SLNB groups, with predominant visualization of lymphatic flow and/or lymph nodes in the arm and axilla (P=0.01) and extra-axillary lymph nodes (P<0.01) in the ALND group. There was no significant difference in the total number of lymph nodes identified between the two groups. However, there was a significant difference in the distribution of lymph nodes in these groups. The cubital lymph node was more often visualized in the immediate dynamic images in the ALND group (P=0.004), while the axillary lymph nodes were more often identified in the delayed scan images of the SLNB group (P<0.01). The deltopectoral lymph node was only identified in the ALND group, but with no significant difference. Conclusion The lymphatic flow from the axilla was redirected to alternative extra-axillary routes in the ALND group. PMID:28331338

  12. Design technology co-optimization for 14/10nm metal1 double patterning layer

    NASA Astrophysics Data System (ADS)

    Duan, Yingli; Su, Xiaojing; Chen, Ying; Su, Yajuan; Shao, Feng; Zhang, Recco; Lei, Junjiang; Wei, Yayi

    2016-03-01

    Design and technology co-optimization (DTCO) can satisfy the needs of the design, generate robust design rule, and avoid unfriendly patterns at the early stage of design to ensure a high level of manufacturability of the product by the technical capability of the present process. The DTCO methodology in this paper includes design rule translation, layout analysis, model validation, hotspots classification and design rule optimization mainly. The correlation of the DTCO and double patterning (DPT) can optimize the related design rule and generate friendlier layout which meets the requirement of the 14/10nm technology node. The experiment demonstrates the methodology of DPT-compliant DTCO which is applied to a metal1 layer from the 14/10nm node. The DTCO workflow proposed in our job is an efficient solution for optimizing the design rules for 14/10 nm tech node Metal1 layer. And the paper also discussed and did the verification about how to tune the design rule of the U-shape and L-shape structures in a DPT-aware metal layer.

  13. Liposome-coated quantum dots targeting the sentinel lymph node

    NASA Astrophysics Data System (ADS)

    Chu, Maoquan; Zhuo, Shu; Xu, Jiang; Sheng, Qiunan; Hou, Shengke; Wang, Ruifei

    2010-01-01

    Sentinel lymph node (SLN) mapping with near-infrared (NIR) quantum dot (QDs) have many advantages over traditional methods. However, as an inorganic nanomaterial, QDs have low biocompatibility and low affinity to the lymphatic system. Here, we encapsulated QDs into nanoscale liposomes and then used these liposome-coated QDs for SLN mapping. The results showed that the liposome-coated QDs exhibited core-shell characterization, and their fluorescence emission did not decrease but slightly increased after being continuously excited by a xenon lamp source (150 W) at 488 nm at 37 °C for 1 h. After storing at 4 °C for more than one and half years, the liposome-coated QDs were found to have retained their spherical structure containing a large amount of QDs. When liposome-coated QDs with average size of 55.43 nm were injected intradermally into the paw of a mouse, the SLN was strongly fluorescent within only a few seconds and visualized easily in real time. Moreover, the fluorescence of the QDs trapped in the SLN could be observed for at least 24 h. Compared with the SLN mapping of QDs absent of liposomes and liposome-coated QDs with a larger average size (100.3 and 153.6 nm), more QDs migrated into the SLN when the liposome-coated QDs with smaller average size (55.43 nm) were injected. This technique may make a great contribution to the improvement of the biocompatibility of QDs and the targeting delivery capacity of QDs into the SLN.

  14. Customized illumination shapes for 193nm immersion lithography

    NASA Astrophysics Data System (ADS)

    Ling, Moh Lung; Chua, Gek Soon; Lin, Qunying; Tay, Cho Jui; Quan, Chenggen

    2008-03-01

    In this paper, a study on customized illumination shape configurations as resolution enhancement for 45nm technology node will be presented. Several new source shape configurations will be explored through simulation based on 193nm immersion lithography on 6% Attenuated Phase Shift Mask. Forbidden pitch effect is commonly encountered in the application of off axis illumination (OAI). The illumination settings are often optimized to allow maximum process window for a pitch. This is done by creating symmetrical distribution of diffraction order on the pupil plane. However, at other pitch, the distribution of diffraction order on the pupil plane results in severe degradation in image contrast and results in significant critical dimension (CD) fluctuation. The problematic pitch is often known as forbidden pitch. It has to be avoided in the design and thus limited the pitch range to be imaged for particular illumination. An approach to modify off axis illumination to minimize the effect of forbidden pitch is explored in this study. The new customized shape for one dimensional line and space pattern is modified from current off axis illumination. Simulation study is done to evaluate the performance some customized shapes. The extent of CD fluctuation and CD through pitch uniformity is analyzed to determine the performance enhancement of the new illumination shapes. From simulation result, the proposed modification have significantly improved the through pitch performance and minimized the effect of forbidden pitch.

  15. Labeling Nodes Using Three Degrees of Propagation

    PubMed Central

    Mostafavi, Sara; Goldenberg, Anna; Morris, Quaid

    2012-01-01

    The properties (or labels) of nodes in networks can often be predicted based on their proximity and their connections to other labeled nodes. So-called “label propagation algorithms” predict the labels of unlabeled nodes by propagating information about local label density iteratively through the network. These algorithms are fast, simple and scale to large networks but nonetheless regularly perform better than slower and much more complex algorithms on benchmark problems. We show here, however, that these algorithms have an intrinsic limitation that prevents them from adapting to some common patterns of network node labeling; we introduce a new algorithm, 3Prop, that retains all their advantages but is much more adaptive. As we show, 3Prop performs very well on node labeling problems ill-suited to label propagation, including predicting gene function in protein and genetic interaction networks and gender in friendship networks, and also performs slightly better on problems already well-suited to label propagation such as labeling blogs and patents based on their citation networks. 3Prop gains its adaptability by assigning separate weights to label information from different steps of the propagation. Surprisingly, we found that for many networks, the third iteration of label propagation receives a negative weight. Availability The code is available from the authors by request. PMID:23284828

  16. Weyl Nodes in Trigonal Tellurium and Selenium

    NASA Astrophysics Data System (ADS)

    Hirayama, Motoaki; Okugawa, Ryo; Ishibashi, Shoji; Murakami, Shuichi; Miyake, Takashi

    2015-03-01

    Singular points in the momentum space (Dirac nodes) have been under intensive investigation recently. Among various Dirac systems, materials having three-dimensional Dirac nodes without spin degeneracy (Weyl nodes) are of particular interest because of their topological nature. We study trigonal Te and Se as systems having both strong spin-orbit interaction (SOI) and broken inversion symmetry, which is necessary for the Weyl node. We calculate the electronic structure by using QMAS based on relativistic density functional theory, and add the self-energy correction in the GW approximation. Te and Se are insulating at ambient pressure. The conduction bands have a spin splitting similar to the Rashba splitting around the H points, but unlike the Rashba splitting the spin directions are radial, forming a hedgehog spin texture. The energy gap decreases with increasing pressure. In the metallic phase, the spin rotates twice around H on the kz = +/- π/c plane, which can be explained by the motion of the Weyl nodes under pressure. We also find that trigonal Te shows the Weyl semimetal phase with time-reversal symmetry under pressure.

  17. Node Survival in Networks under Correlated Attacks

    PubMed Central

    Hao, Yan; Armbruster, Dieter; Hütt, Marc-Thorsten

    2015-01-01

    We study the interplay between correlations, dynamics, and networks for repeated attacks on a socio-economic network. As a model system we consider an insurance scheme against disasters that randomly hit nodes, where a node in need receives support from its network neighbors. The model is motivated by gift giving among the Maasai called Osotua. Survival of nodes under different disaster scenarios (uncorrelated, spatially, temporally and spatio-temporally correlated) and for different network architectures are studied with agent-based numerical simulations. We find that the survival rate of a node depends dramatically on the type of correlation of the disasters: Spatially and spatio-temporally correlated disasters increase the survival rate; purely temporally correlated disasters decrease it. The type of correlation also leads to strong inequality among the surviving nodes. We introduce the concept of disaster masking to explain some of the results of our simulations. We also analyze the subsets of the networks that were activated to provide support after fifty years of random disasters. They show qualitative differences for the different disaster scenarios measured by path length, degree, clustering coefficient, and number of cycles. PMID:25932635

  18. Node Survival in Networks under Correlated Attacks.

    PubMed

    Hao, Yan; Armbruster, Dieter; Hütt, Marc-Thorsten

    2015-01-01

    We study the interplay between correlations, dynamics, and networks for repeated attacks on a socio-economic network. As a model system we consider an insurance scheme against disasters that randomly hit nodes, where a node in need receives support from its network neighbors. The model is motivated by gift giving among the Maasai called Osotua. Survival of nodes under different disaster scenarios (uncorrelated, spatially, temporally and spatio-temporally correlated) and for different network architectures are studied with agent-based numerical simulations. We find that the survival rate of a node depends dramatically on the type of correlation of the disasters: Spatially and spatio-temporally correlated disasters increase the survival rate; purely temporally correlated disasters decrease it. The type of correlation also leads to strong inequality among the surviving nodes. We introduce the concept of disaster masking to explain some of the results of our simulations. We also analyze the subsets of the networks that were activated to provide support after fifty years of random disasters. They show qualitative differences for the different disaster scenarios measured by path length, degree, clustering coefficient, and number of cycles.

  19. Short-range demonstrations of monocular passive ranging using O2 (X3Σg- → b1Σg+) absorption spectra.

    PubMed

    Hawks, Michael R; Vincent, R Anthony; Martin, Jacob; Perram, Glen P

    2013-05-01

    The depth of absorption bands in observed spectra of distant, bright sources can be used to estimate range to the source. Experimental results are presented based on observations of the O2 X(v" = 0) → b(v' = 0) absorption band centered around 762 nm and the O2 X(v" = 0) → b(v' = 1) band around 689 nm. Range is estimated by comparing observed values of band-average absorption against predicted curves derived from either historical data or model predictions. Accuracy of better than 0.5% was verified in short-range (up to 3 km), static experiments using a high-resolution (1 cm(-1)) spectroradiometer. This method was also tested against the exhaust plume of a Falcon 9 rocket launched from Cape Canaveral, Florida. The rocket was launched from an initial range of 13 km and tracked for 90 s after ignition. Range error was below 2% for the first 30 s and consistent with predicted error throughout the track.

  20. Portable widefield imaging device for ICG-detection of the sentinel lymph node

    NASA Astrophysics Data System (ADS)

    Govone, Angelo Biasi; Gómez-García, Pablo Aurelio; Carvalho, André Lopes; Capuzzo, Renato de Castro; Magalhães, Daniel Varela; Kurachi, Cristina

    2015-06-01

    Metastasis is one of the major cancer complications, since the malignant cells detach from the primary tumor and reaches other organs or tissues. The sentinel lymph node (SLN) is the first lymphatic structure to be affected by the malignant cells, but its location is still a great challenge for the medical team. This occurs due to the fact that the lymph nodes are located between the muscle fibers, making it visualization difficult. Seeking to aid the surgeon in the detection of the SLN, the present study aims to develop a widefield fluorescence imaging device using the indocyanine green as fluorescence marker. The system is basically composed of a 780nm illumination unit, optical components for 810nm fluorescence detection, two CCD cameras, a laptop, and dedicated software. The illumination unit has 16 diode lasers. A dichroic mirror and bandpass filters select and deliver the excitation light to the interrogated tissue, and select and deliver the fluorescence light to the camera. One camera is responsible for the acquisition of visible light and the other one for the acquisition of the ICG fluorescence. The software developed at the LabVIEW® platform generates a real time merged image where it is possible to observe the fluorescence spots, related to the lymph nodes, superimposed at the image under white light. The system was tested in a mice model, and a first patient with tongue cancer was imaged. Both results showed the potential use of the presented fluorescence imaging system assembled for sentinel lymph node detection.

  1. Molecular organization of cytokinesis nodes and contractile rings by super-resolution fluorescence microscopy of live fission yeast

    PubMed Central

    Laplante, Caroline; Huang, Fang; Tebbs, Irene R.; Bewersdorf, Joerg; Pollard, Thomas D.

    2016-01-01

    Cytokinesis in animals, fungi, and amoebas depends on the constriction of a contractile ring built from a common set of conserved proteins. Many fundamental questions remain about how these proteins organize to generate the necessary tension for cytokinesis. Using quantitative high-speed fluorescence photoactivation localization microscopy (FPALM), we probed this question in live fission yeast cells at unprecedented resolution. We show that nodes, protein assembly precursors to the contractile ring, are discrete structural units with stoichiometric ratios and distinct distributions of constituent proteins. Anillin Mid1p, Fes/CIP4 homology-Bin/amphiphysin/Rvs (F-BAR) Cdc15p, IQ motif containing GTPase-activating protein (IQGAP) Rng2p, and formin Cdc12p form the base of the node that anchors the ends of myosin II tails to the plasma membrane, with myosin II heads extending into the cytoplasm. This general node organization persists in the contractile ring where nodes move bidirectionally during constriction. We observed the dynamics of the actin network during cytokinesis, starting with the extension of short actin strands from nodes, which sometimes connected neighboring nodes. Later in cytokinesis, a broad network of thick bundles coalesced into a tight ring around the equator of the cell. The actin ring was ∼125 nm wide and ∼125 nm thick. These observations establish the organization of the proteins in the functional units of a cytokinetic contractile ring. PMID:27647921

  2. Node-surface and node-line fermions from nonsymmorphic lattice symmetries

    NASA Astrophysics Data System (ADS)

    Liang, Qi-Feng; Zhou, Jian; Yu, Rui; Wang, Zhi; Weng, Hongming

    2016-02-01

    We propose a kind of topological quantum state of semimetals in the quasi-one-dimensional (1D) crystal family BaMX 3 (M =V , Nb, or Ta; X =S or Se) by using symmetry analysis and first-principles calculation. We find that in BaVS3 the valence and conduction bands are degenerate in the kz=π /c plane (c is the lattice constant along the z ̂ axis) of the Brillouin zone (BZ). These nodal points form a node surface, and they are protected by a nonsymmorphic crystal symmetry consisting of a twofold rotation about the z ̂ axis and a half-translation along the same z ̂ axis. The band degeneracy in the node surface is lifted in BaTaS3 by including strong spin-orbit coupling (SOC) of Ta. The node surface is reduced into 1D node lines along the high-symmetry paths kx=0 and kx=±√{3 }ky on the kz=π /c plane. These node lines are robust against SOC and guaranteed by the symmetries of the P 63/m m c space group. These node-line states are entirely different from previous proposals which are based on the accidental band touchings. We also propose a useful material design for realizing topological node-surface and node-line semimetals.

  3. Distribution of purinergic P2X receptors in the equine digit, cervical spinal cord and dorsal root ganglia.

    PubMed

    Zamboulis, D E; Senior, J M; Clegg, P D; Gallagher, J A; Carter, S D; Milner, P I

    2013-09-01

    Purinergic pathways are considered important in pain transmission, and P2X receptors are a key part of this system which has received little attention in the horse. The aim of this study was to identify and characterise the distribution of P2X receptor subtypes in the equine digit and associated vasculature and nervous tissue, including peripheral nerves, dorsal root ganglia and cervical spinal cord, using PCR, Western blot analysis and immunohistochemistry. mRNA signal for most of the tested P2X receptor subunits (P2X1-5, 7) was detected in all sampled equine tissues, whereas P2X6 receptor subunit was predominantly expressed in the dorsal root ganglia and spinal cord. Western blot analysis validated the specificity of P2X1-3, 7 antibodies, and these were used in immunohistochemistry studies. P2X1-3, 7 receptor subunits were found in smooth muscle cells in the palmar digital artery and vein with the exception of the P2X3 subunit that was present only in the vein. However, endothelial cells in the palmar digital artery and vein were positive only for P2X2 and P2X3 receptor subunits. Neurons and nerve fibres in the peripheral and central nervous system were positive for P2X1-3 receptor subunits, whereas glial cells were positive for P2X7 and P2X1 and 2 receptor subunits. This previously unreported distribution of P2X subtypes may suggest important tissue specific roles in physiological and pathological processes.

  4. "Fast" and "thick" e-beam resists exposed with multi-beam tool at 5 keV for implants and mature nodes: experimental and simulated model study

    NASA Astrophysics Data System (ADS)

    Fay, Aurélien; Thiam, Ndeye A.; Cordini, Marie-Laure; Servin, Isabelle; Constancias, Christophe; Lattard, Ludovic; Pain, Laurent

    2015-03-01

    In addition to sub-20 nm technology nodes, multi-beam lithography at low-energy has also the capability to address mature CMOS technologies [130-45nm nodes] with high throughput and significant manufacturing costs reduction. It requires both "fast" resists for throughput gain and cost of ownership and "thick" resists matched with the current post-lithography processes such as etching and implant steps. We successfully demonstrated patterning of 45-130 nm nodes structures on different thick resists (up to 160 nm) with a 5 keV Mapper pre-alpha tool. In parallel, we developed a theoretical model to simulate 3D patterning showing good agreement with our experimental results.

  5. Node degree distribution in spanning trees

    NASA Astrophysics Data System (ADS)

    Pozrikidis, C.

    2016-03-01

    A method is presented for computing the number of spanning trees involving one link or a specified group of links, and excluding another link or a specified group of links, in a network described by a simple graph in terms of derivatives of the spanning-tree generating function defined with respect to the eigenvalues of the Kirchhoff (weighted Laplacian) matrix. The method is applied to deduce the node degree distribution in a complete or randomized set of spanning trees of an arbitrary network. An important feature of the proposed method is that the explicit construction of spanning trees is not required. It is shown that the node degree distribution in the spanning trees of the complete network is described by the binomial distribution. Numerical results are presented for the node degree distribution in square, triangular, and honeycomb lattices.

  6. Energy Options for Wireless Sensor Nodes

    PubMed Central

    Knight, Chris; Davidson, Joshua; Behrens, Sam

    2008-01-01

    Reduction in size and power consumption of consumer electronics has opened up many opportunities for low power wireless sensor networks. One of the major challenges is in supporting battery operated devices as the number of nodes in a network grows. The two main alternatives are to utilize higher energy density sources of stored energy, or to generate power at the node from local forms of energy. This paper reviews the state-of-the art technology in the field of both energy storage and energy harvesting for sensor nodes. The options discussed for energy storage include batteries, capacitors, fuel cells, heat eng