Science.gov

Sample records for 350-1000 nm obtained

  1. Inversion of photometric He+ (30.4 nm) intensities to obtain He+ distributions

    NASA Astrophysics Data System (ADS)

    Garrido, Dante E.; Smith, Roger W.; Marsh, C. A.; Christensen, Andrew B.; Chakrabarti, Supriya

    1993-07-01

    Radiation at He(superscript +) at 30.4 nm, which is emitted close to the Earth, comes from three distinct regions; the ionosphere, the plasmasphere and the polar cap. Published observational data on He(superscript +) 30.4 nm have shown that the intensities from polar regions are relatively smaller than the other regions. Polar emissions are believed to be due to resonant scattering of ion outflow in sunlight. A 1982 rocket flight from Poker Flat, Alaska has shown that line-of-sight 30.4 nm emission rates are relatively strong in the direction of the pole. Since the roll of the rocket afforded many different observing directions, we have used the variety of viewing geometries to extract ionospheric source densities from the photometric intensity data. We have assumed that the He(superscript +) densities vary with distance along dipole field lines according to a particular functional form, and then we proceeded to extract the source densities by a matrix inversion method. The results give density variations over a range of latitudes including samples from each of the regions mentioned above. The method obtains good fits of the observed profiles of intensity versus observation angle.

  2. Seasonal dependence of MSTIDs obtained from 630.0 nm airglow imaging at Arecibo

    NASA Astrophysics Data System (ADS)

    Martinis, C.; Baumgardner, J.; Wroten, J.; Mendillo, M.

    2010-06-01

    All-sky imaging data of 630.0 nm airglow emissions are used to study the seasonal and solar activity dependence of medium-scale traveling ionospheric disturbances (MSTIDs) over Arecibo, Puerto Rico (18.3° N, 66.7° W, 28° N mag lat). MSTIDs are typical F-region signatures at midlatitudes, yet limited statistical results in the American sector hindered the progress in our understanding of these dynamical structures. This study compiles data from 2002 to 2007 and shows for the first time that optically-determined MSTIDs at Arecibo present a semiannual pattern with peak occurrence at both solstices. In the Japanese longitude sector, a similar pattern has been found, but one with a main peak during local summer. This paper explains the high occurrence rate during local winter at Arecibo via E-layer/F-layer coupling and inter-hemispheric coupling, thus accounting for a consistent morphology between the two longitude sectors.

  3. Evaluation of Ionospheric Parameters Obtained by Inverting O II 83.4 nm Dayglow Profiles from RAIDS

    NASA Astrophysics Data System (ADS)

    Geddes, G.; Chakrabarti, S.; Cook, T.; Douglas, E. S.

    2014-12-01

    We test ionospheric parameters obtained by inverting O II 83.4 nm dayglow profiles against coincident ground-based measurements of electron density. Limb profiles from the Remote Atmospheric and Ionospheric Detection System (RAIDS) EUV Spectrograph on the International Space Station (ISS) are compared to a radiative transfer model which assumes a Chapman-α electron density profile fit to an independent ground-based measurement.

  4. Obtaining nanoimprint template gratings with 10 nm half-pitch by atomic layer deposition enabled spacer double patterning.

    PubMed

    Dhuey, S; Peroz, C; Olynick, D; Calafiore, G; Cabrini, S

    2013-03-15

    A strategy for fabricating nanoimprint templates with sub-10 nm line and 20 nm pitch gratings is demonstrated, by combining electron beam lithography and atomic layer deposition. This is achieved through pitch division using a spacer double-patterning technique. The nanostructures are then replicated using step-and-repeat ultra-violet assisted nanoimprint lithography. PMID:23416694

  5. Absorption Spectra and Absorption Coefficients for Methane in the 750-940 nm region obtained by Intracavity Laser Spectroscopy

    NASA Astrophysics Data System (ADS)

    O'Brien, J. J.; Cao, H.

    2000-10-01

    Methane spectral features are prominent in the reflected sunlight spectra from the outer planets and some of their major satellites and can provide useful information on the atmospheres of those bodies. Methane bands occurring in the visible to near-IR region are particularly important because for many of these planetary bodies, methane bands occurring in the IR are saturated. Spectral observations of these bodies also are being made at increasingly higher resolution. In order to interpret the planetary spectra, laboratory data for methane obtained at appropriate sample conditions and spectral resolution are required. Since the visible to near-IR spectrum of methane is intrinsically weak, sensitive techniques are required to perform the laboratory measurements. We have employed the intracavity laser spectroscopy (ILS) technique to record methane spectrum in the visible to near-IR region. New results for room temperature methane in the 10,635 - 13,300 cm-1 region and for liquid nitrogen temperature (77 K) methane in the 10,860 - 11,605 cm-1 region will be presented. Spectra throughout the more strongly absorbing sections will be shown. These spectra are acquired at a resolution of 400,000 - 500,000 and are calibrated using iodine reference spectra acquired from an extra-cavity cell at nearly the same time as when the methane data are recorded. From the spectra, absorption coefficients are determined and these are presented as averages over 1 Å and 1 cm-1 intervals. In order to obtain the results, spectra are deconvolved for the instrument function using a Fourier transform technique. The validity of the approach is verified from studies of isolated oxygen lines in the A band occurring around 760 nm. Good agreement is observed between the intensity values determined from the FT deconvolution and integration method and those derived by fitting the observed line profiles to Voigt line-shapes convoluted with the instrument function. The methane results are compared

  6. 50W CW visible laser source at 589nm obtained via frequency doubling of three coherently combined narrow-band Raman fibre amplifiers.

    PubMed

    Taylor, Luke R; Feng, Yan; Calia, Domenico Bonaccini

    2010-04-12

    We demonstrate the cascaded coherent collinear combination of a seed-split triplet of 1178nm high-power narrow-band (sub-1.5MHz) SBS-suppressed CW Raman fibre amplifiers via nested free-space constructive quasi-Mach-Zehnder interferometry, after analysing the combination of the first two amplifiers in detail. Near-unity combination and cascaded-combination efficiencies are obtained at all power levels up to a maximum P(1178) > 60W. Frequency doubling of this cascaded-combined output in an external resonant cavity yields P(589) > 50W with peak conversion efficiency eta(589) ~85%. We observe no significant differences between the SHG of a single, combined pair or triplet of amplifiers. Although the system represents a successful power scalability demonstrator for fibre-based Na-D(2a)-tuned mesospheric laser-guide-star systems, we emphasise its inherent wavelength versatility and consider its spectroscopic and near-diffraction-limited qualities equally well suited to other applications. PMID:20588700

  7. Structure and properties of dies obtained from scrap of 5KhNM and R6M5 steels by electroslag remelting

    SciTech Connect

    Timchenko, E.I.; Semenova, L.M.; Berezkin, Yu.A.; Zaitseva, I.D.

    1987-11-01

    It is known that in a number of cases cast dies of tool steels for hot working possess increased life. In the Lozovaya Forging and Machining Plant in electroslag remelting (ESR) of worn dies, a method is used making it possible to improve the quality of the cast blanks (dies) by additional alloying of them. A consumable composite electrode made of worn dies of 5KhNM steel reforged into bars and butt welded and scrap of R6M5 tool steel welded along the whole length of the main electrode in the form of a solid bar is used. Practically none of the chromium, molybdenum, tungsten, and vanadium additionally added in electroslag remelting burns off and therefore it is sufficient to add the expensive R6M5 steel scrap once. The improved characteristics of the steel are maintained in subsequent operations in the production chain. A comparative investigation was made of the character of the structure in the as-cast, annealed, hardened, and tempered conditions of 5KhNMVF steel produced by the above method and of 5KhNM steel produced by different methods.

  8. Changes in Precipitation Sources over Glacial/Interglacial MIS 11 and 12 Examined by Δ17O of SiO2 Obtained from Diatoms along the Valles Caldera Lake Core, NM

    NASA Astrophysics Data System (ADS)

    Gibbons, J.; Sharp, Z. D.; Fawcett, P. J.

    2015-12-01

    Quantitative estimates of the isotopic composition of paleo-lake water have been made using 18O/16O (ẟ18O) in diatom silica (Dodd and Sharp, GCA, 2010). Post-mortem diatom silica equilibrates with ambient lake water within six months, chronicling the bulk oxygen isotope composition of the lake and resulting in silica that is near the quartz-water fractionation line (Dodd et al, GGG, 2012). The δ18O values of lacustrine diatoms from the Valles Caldera, NM, vary by ~25‰ between glacial and interglacial periods and suggest a collapse of the summer monsoon that currently provides 50% of the modern precipitation in NM. Triple oxygen isotope measurements of diatom silica may serve as a proxy for the isotopic composition of the lake water and as an estimate of paleo-humidity over the precipitation source. The deuterium excess parameter (d= ẟD - 8 ẟ18O) has been used along ice cores as a source relative humidity index, but is difficult to make in lake sediments. Instead, high precision 17O-excess (∆17O) measurements (=ẟ17O - 0.528 ẟ18O) may provide paleo-humidity information. Landais et al. (GRL, 2008) found a ∆17O difference of 0.02‰ in the Vostok ice core between glacial and interglacial times, interpreted as a function of changing relative humidity of the precipitation source. A 0.03‰ change was observed in glacial (∆17O=-0.22‰) and interglacial (∆17O=-0.19‰) diatom silica along the Valles Caldera lake core. Further information regarding the δ18O value of meteoric water can be calculated from paired δ18O-δ17O measurements. The combined δ18O-δ17O values of interglacial diatoms suggest a δ18Ometeoric water value of -9‰. Modern δ18O value of monsoonal precipitation in NM is ~-10‰. The δ18O of glacial diatoms suggest a δ18Ometeoric water = -20‰. Modern δ18O value of winter precipitation in NM is ~-20‰. These results suggest that the seasonality of precipitation in New Mexico can be inferred based on changes in the relative

  9. A non-contact measurement technique to measure micro-surface stress and obtain deformation profiles of the order of 1nm in microcantilever-based structures by single image optical diffraction method

    NASA Astrophysics Data System (ADS)

    Phani, Arindam

    2010-06-01

    A new method based on analysis of a single diffraction pattern is proposed to measure deflections in micro-cantilever (MC) based sensor probes, achieving typical deflection resolutions of 1nm and surface stress changes of 50μN/m. The proposed method employs a double MC structure where the deflection of one of the micro-cantilevers relative to the other due to surface stress changes results in a linear shift of intensity maxima of the Fraunhofer diffraction pattern of the transilluminated MC. Measurement of such shifts in the intensity maxima of a particular order along the length of the structure can be done to an accuracy of 0.01mm leading to the proposed sensitivity of deflection measurement in a typical microcantilever. This method can overcome the fundamental measurement sensitivity limit set by diffraction and pointing stability of laser beam in the widely used Optical Beam Deflection method (OBDM).

  10. 1085 nm Nd:YVO4 laser intracavity pumped at 914 nm and sum-frequency mixing to reach cyan laser at 496 nm

    NASA Astrophysics Data System (ADS)

    Lü, Y. F.; Xia, J.; Yin, X. D.; Wang, D.; Zhang, X. H.

    2010-01-01

    We present for the first time a Nd:YVO4 laser at 1085 nm intracavity pumped at 914 nm by a Nd:YVO4 laser. We obtained intracavity powers of 57 W at 914 nm and 62 W at 1085 nm. Using type-I critical phase-matching LiB3O5 (LBO) crystal, a cyan laser at 496 nm is obtained by 914 and 1085 nm intracavity sum-frequency mixing. The maximum laser output power of 142 mW is obtained when an incident pump laser of 19.6 W is used.

  11. Simultaneous three-wavelength continuous wave laser at 946 nm, 1319 nm and 1064 nm in Nd:YAG

    NASA Astrophysics Data System (ADS)

    Lü, Yanfei; Zhao, Lianshui; Zhai, Pei; Xia, Jing; Fu, Xihong; Li, Shutao

    2013-01-01

    A continuous-wave (cw) diode-end-pumped Nd:YAG laser that generates simultaneous laser at the wavelengths 946 nm, 1319 nm and 1064 nm is demonstrated. The optimum oscillation condition for the simultaneous three-wavelength operation has been derived. Using the separation of the three output couplers, we obtained the maximum output powers of 0.24 W at 946 nm, 1.07 W at 1319 nm and 1.88 W at 1064 nm at the absorbed pump power of 11.2 W. A total output power of 3.19 W for the three-wavelength was achieved at the absorbed pump power of 11.2 W with optical conversion efficiency of 28.5%.

  12. UV - ALBUQUERQUE NM

    EPA Science Inventory

    Brewer 109 is located in Albuquerque NM, measuring ultraviolet solar radiation. Irradiance and column ozone are derived from this data. Ultraviolet solar radiation is measured with a Brewer Mark IV, single-monochrometer, spectrophotometer manufactured by SCI-TEC Instruments, Inc....

  13. Albuquerque, NM, USA

    NASA Technical Reports Server (NTRS)

    1991-01-01

    Albuquerque, NM (35.0N, 106.5W) is situated on the edge of the Rio Grande River and flood plain which cuts across the image. The reddish brown surface of the Albuquerque Basin is a fault depression filled with ancient alluvial fan and lake bed sediments. On the slopes of the Manzano Mountains to the east of Albuquerque, juniper and other timber of the Cibola National Forest can be seen as contrasting dark tones of vegetation.

  14. 1064 nm Nd:YAG laser intracavity pumped at 946 nm and sum-frequency mixing for an emission at 501 nm

    NASA Astrophysics Data System (ADS)

    Lü, Y. F.; Zhang, X. H.; Xia, J.; Jin, G. Y.; Wang, J. G.; Yin, X. D.; Zhang, A. F.

    2010-05-01

    We present for the first time a Nd:YAG laser emitting at 1064 nm intracavity pumped by a 946 nm diode-pumped Nd:YAG laser. A 809 nm laser diode is used to pump the first Nd:YAG crystal emitting at 946 nm, and the second Nd:YAG laser emitting at 1064 nm intracavity pumped at 946 nm. Intracavity sum-frequency mixing at 946 and 1064 nm was then realized in a LBO crystal to reach the cyan range. We obtained a continuous-wave output power of 485 mW at 501 nm with a pump laser diode emitting 25.4 W at 809 nm.

  15. Comparative study of Nd:KGW lasers pumped at 808 nm and 877 nm

    NASA Astrophysics Data System (ADS)

    Huang, Ke; Ge, Wen-Qi; Zhao, Tian-Zhuo; He, Jian-Guo; Feng, Chen-Yong; Fan, Zhong-Wei

    2015-10-01

    The laser performance and thermal analysis of Nd:KGW laser continuously pumped by 808 nm and 877 nm are comparatively investigated. Output power of 670 mW and 1587 mW, with nearly TEM00 mode, are achieved respectively at 808 nm pump and 877 nm pump. Meanwhile, a high-power passively Q-switched Nd:KGW/Cr4+:YAG laser pumped at 877 nm is demonstrated. An average output power of 1495 mW is obtained at pump power of 5.22 W while the laser is operating at repetition of 53.17 kHz. We demonstrate that 877 nm diode laser is a more potential pump source for Nd:KGW lasers.

  16. 810nm, 980nm, 1470nm and 1950nm diode laser comparison: a preliminary "ex vivo" study on oral soft tissues

    NASA Astrophysics Data System (ADS)

    Fornaini, Carlo; Merigo, Elisabetta; Sozzi, Michele; Selleri, Stefano; Vescovi, Paolo; Cucinotta, Annamaria

    2015-02-01

    The introduction of diode lasers in dentistry has several advantages, mainly consisting on the reduced size, reduced cost and possibility to beam delivering by optical fibers. At the moment the two diode wavelengths normally utilized in the dental field are 810 and 980 nm for soft tissues treatments. The aim of this study was to compare the efficacy of four different diode wavelengths: 810, 980, 1470 and 1950 nm diode laser for the ablation of soft tissues. Several samples of veal tongue were exposed to the four different wavelengths, at different fluences. The internal temperature of the soft tissues, in the area close to the beam, was monitored with thermocouple during the experiment. The excision quality of the exposed samples have been characterized by means of an optical microscope. Tissue damages and the cut regularity have been evaluated on the base of established criteria. The lowest thermal increase was recorded for 1950 nm laser. Best quality and speed of incision were obtained by the same wavelength. By evaluating epithelial, stromal and vascular damages for all the used wavelengths, the best result, in terms of "tissue respect", have been obtained for 1470 and 1950 nm exposures. From the obtained results 1470 and 1950 nm diode laser showed to be the best performer wavelengths among these used in this "ex vivo" study, probably due to their greatest affinity to water.

  17. 469nm Fiber Laser Source

    SciTech Connect

    Drobshoff, A; Dawson, J W; Pennington, D M; Payne, S A; Beach, R

    2005-01-20

    We have demonstrated 466mW of 469nm light from a frequency doubled continuous wave fiber laser. The system consisted of a 938nm single frequency laser diode master oscillator, which was amplified in two stages to 5 Watts using cladding pumped Nd{sup 3+} fiber amplifiers and then frequency doubled in a single pass through periodically poled KTP. The 3cm long PPKTP crystal was made by Raicol Crystals Ltd. with a period of 5.9 {micro}m and had a phase match temperature of 47 degrees Centigrade. The beam was focused to a 1/e{sup 2} diameter in the crystal of 29 {micro}m. Overall conversion efficiency was 11% and the results agreed well with standard models. Our 938nm fiber amplifier design minimizes amplified spontaneous emission at 1088nm by employing an optimized core to cladding size ratio. This design allows the 3-level transition to operate at high inversion, thus making it competitive with the 1088nm 4-level transition. We have also carefully chosen the fiber coil diameter to help suppress propagation of wavelengths longer than 938 nm. At 2 Watts, the 938nm laser had an M{sup 2} of 1.1 and good polarization (correctable with a quarter and half wave plate to >10:1).

  18. An 885-nm Direct Pumped Nd:CNGG 1061 nm Q-Switched Laser

    NASA Astrophysics Data System (ADS)

    Li, Qi-Nan; Zhang, Tao; Feng, Bao-Hua; Zhang, Zhi-Guo; Zhang, Huai-Jin; Wang, Ji-Yang

    2014-07-01

    The 885 nm direct pumping method, directly into the 4F3/2 emitting level of Nd3+ ion, is used to a Nd:CNGG crystal to product passive Q-switched 1061 nm laser pulses, for the first time to the best of our knowledge. A maximum average output power of 1.16 W for 1061 nm Q-switched pulses and a repetition rate of 12.54 kHz are obtained. The pulse width is measured to be 24 ns and the peak power is 3.843 kW. A high-quality fundamental transverse mode can be observed owing to the reduction of the thermal effect for Nd:CNGG crystal by 885 nm direct pumping.

  19. Infrared Luminescence at 1010 nm and 1500 nm in LiNbO3:Er3+ Excitted by Short Pulse Radiation at 980 nm

    NASA Astrophysics Data System (ADS)

    Kokanyan, E. P.; Demirkhanyan, G. G.; Steveler, E.; Rinnert, H.; Aillerie, M.

    Luminescence of LiNbO3:Er3+ crystal at a wavelength of 1010 nm and 1500 nm under pulsed excitation of different power at a wavelength of 980 nm are experimentally and theoretically studied. It is revealed, that the main part of the absorbed energy gives rise to the luminescence at 1500 nm. Considered concentrations of Er3+ impurity ions allow to exclude cooperative processes in the impurity subsystem. The experimental results are interpreted in the framework of a three electronic levels system, assuming that the population of the higher lasing level 4I13/2 in the crystal under study is caused by relaxation processes from the excited level. It is shown that for obtaining of a laser radiation at about 1500 nm one can effectively use a pulse-pumping at 980 nm with a power density in a range of 50 ÷ 60 MW/cm2.

  20. 551 nm Generation by sum-frequency mixing of intracavity pumped Nd:YAG laser

    NASA Astrophysics Data System (ADS)

    Dong, Y.; Li, S. T.; Zhang, X. H.

    2012-02-01

    We present for the first time a Nd:YAG laser emitting at 1319 nm intracavity pumped by a 946 nm diode-pumped Nd:YAG laser. A 809 nm laser diode is used to pump the first Nd:YAG crystal emitting at 946 nm, and the second Nd:YAG laser emitting at 1319 nm intracavity pumped at 946 nm. Intracavity sumfrequency mixing at 946 and 1319 nm was then realized in a LBO crystal to reach the yellow range. We obtained a continuous-wave output power of 158 mW at 551 nm with a pump laser diode emitting 18.7 W at 809 nm.

  1. Photoionization of Nitromethane at 355nm and 266nm

    NASA Astrophysics Data System (ADS)

    Martínez, Denhi; Betancourt, Francisco; Poveda, Juan Carlos; Guerrero, Alfonso; Cisneros, Carmen; Álvarez, Ignacio

    2014-05-01

    Nitromethane is one of the high-yield clean liquid fuels, i.e., thanks to the oxygen contained in nitromethane, much less atmospheric oxygen is burned compared to hydrocarbons such as gasoline, making the nitromethane an important prototypical energetic material, the understanding of its chemistry is relevant in other fields such as atmospheric chemistry or biochemistry. In this work we present the study of photoionization dynamics by multiphoton absorption with 355 nm and 266 nm wavelength photons, using time of flight spectrometry in reflectron mode (R-TOF). Some of the observed ion products appear for both wavelength and other only in one of them; both results were compared with preview observations and new ions were detected. This work is supported by CONACYT grant 165410 and DGAPA-UNAM grants IN-107-912 and IN-102-613.

  2. 1319 nm and 1356 nm dual-wavelength operation of diode-side-pumped Nd:YAG laser

    NASA Astrophysics Data System (ADS)

    Chen, Ming; Wang, Zhi-chao; Zhang, Shen-jin; Yang, Feng; Zhang, Feng-feng; Yuan, Lei; He, Miao; Li, Jia-jia; Zhang, Xiao-wen; Zong, Nan; Wang, Zhi-min; Bo, Yong; Peng, Qin-jun; Cui, Da-fu; Xu, Zu-yan

    2016-05-01

    We report the first demonstration on a diode-side-pumped quasi continuous wave (QCW) dual-wavelength Nd:YAG laser operating at 1319 nm and 1356 nm. The resonator adopts symmetrical L-shaped flat-flat structure working in a thermally near unstable cavity. By precise coating on the cavity mirrors, the simultaneous oscillation at 1319 nm and 1356 nm is delivered. A maximum dual-wavelength output power of 9.4 W is obtained. The beam quality factor M2 is measured to be 1.9.

  3. OISL transmitter at 985 nm

    NASA Astrophysics Data System (ADS)

    Larose, Robert; Lauzon, Jocelyn; Mohrdiek, Stefan; Harder, Christoph S.; Changkakoti, Rupak; Park, Peter

    1999-04-01

    For high data rate (greater than 1 Gbps) Optical Inter- Satellite Link (OISL), a compact laser transmitter with high power and good efficiency is required. A trade-off analysis between the technologies such as the mature 840 nm laser diodes, 1064 nm diode-pumped solid state laser and the more recent 1550 nm Erbium Doped Fiber Amplifier (EDFA) is used to find the optical solution. The Si-APDs are preferred for their large detector areas and good noise figures which reduce the tracking requirements and simplify optical design of the receiver. Because of significant amount of power needed to close the link distance up to 7000 km (LEO-LEO), use of 840 nm diodes is limited. In this paper, we present an alternative system based on a system concept denoted as the SLYB (Semiconductor Laser Ytterbium Booster). The SLYB uses a polarization maintaining double-clad ytterbium fiber as a power amplifier. The device houses two semiconductor diodes that are designed to meet telecom reliability: a broad-area 917 nm pump diode and a directly modulated FP laser for signal generation. The output signal is in a linearly polarized state with an extinction ratio of 20 dB. The complete module (15 X 12 X 4.3 cm3) weighs less than 0.9 kg and delivers up to 27 dBm average output power at 985 nm. Designed primarily for direct detection using Si APDs, the transmitter offers a modulation data rate of at least 1.5 Gb/s with a modulation extinction ratio better than 13 dB. Total power consumption is expected to be lower than 8 W by using an uncooled pump laser. Preliminary radiation testing of the fiber indicates output power penalty of 1.5 dB at the end of 10 years in operation. We are presently investigating the fabrication of an improved radiation-hardened Yb-fiber for the final prototype to reduce this penalty. For higher data rate the design can be extended to a Wavelength Division Multiplexing (WDM) scheme adding multiple channels.

  4. Sub-50nm extreme ultraviolet holographic imaging

    NASA Astrophysics Data System (ADS)

    Wachulak, P. W.; Marconi, M. C.; Bartels, R. A.; Menoni, C. S.; Rocca, J. J.

    2009-05-01

    Imaging tools for nanoscicence involving sub-100-nm scale objects have been dominated by atomic force microscopy (AFM), scanning tunneling microscopy (STM), and electron microscopy (SEM, TEM). These imaging techniques have contributed substantially to the development of nanoscience, providing a very powerful diagnostic tool capable of obtaining images with atomic resolution or as a subsidiary mechanism to arrange or modify surfaces also at the atomic scale [1,2]. However, some important problems have persisted traditional nanoscale imaging techniques. For example when scanning a nanometer size object that is not attached rigidly to a surface the interaction with the tip significantly perturbs the specimen degrading or eventually precluding the image acquisition. Electron microscopy often requires surface preparation, consisting of metallization of the sample to avoid surface charging. Additionally the metallization of the sample may alter its characteristics and also limits the resolution. In both cases, if the sample is large (millimeters in size) due to the limited field of view, the image obtained with these conventional methods is only representative of a very small portion of the object. Wavelength-limited holographic imaging using carbon nanotubes as the test object with a table-top extreme ultraviolet (EUV) laser operating at 46.9 nm will be discussed. The resolution achieved in this imaging is evaluated with a rigorous correlation image analysis and confirmed with the conventional knife-edge test. The nano-holography presented requires no optics or critical beam alignment; thus the hologram recording scheme is very simple and does not need special sample preparation. In holography, image contrast requires absorption to provide scattering by the illuminating beam. The EUV laser wavelength employed in this experiment (46.9nm) is advantageous because carbon based materials typically exhibit very small attenuation lengths, around 25 nm. The high absorption of

  5. Comparison of 885 nm pumping and 808 nm pumping in Nd:CNGG laser operating at 1061 nm and 935 nm

    NASA Astrophysics Data System (ADS)

    Shi, Yuxian; Li, Qinan; Zhang, Dongxiang; Feng, Baohua; Zhang, Zhiguo; Zhang, Huaijin; Wang, Jiyang

    2010-07-01

    A Nd:CNGG laser operated at 935 nm and 1061 nm pumped at 885 nm and 808 nm, respectively, is demonstrated. The 885 nm direct pumping scheme shows some advantages over the 808 nm traditional pumping scheme. It includes higher slope efficiency, lower threshold, and better beam quality at high output power. With the direct pumping, the slope efficiency increases by 43% and the threshold decreases by 10% compared with traditional pumping in the Nd:CNGG laser operated at 935 nm. When the Nd:CNGG laser operates at 1061 nm, the direct pumping increases the slope efficiency by 14% with a 20% reduction in the oscillation threshold.

  6. High-efficency stable 213-nm generation for LASIK application

    NASA Astrophysics Data System (ADS)

    Wang, Zhenglin; Alameh, Kamal; Zheng, Rong

    2005-01-01

    213nm Solid-state laser technology provides an alternative method to replace toxic excimer laser in LASIK system. In this paper, we report a compact fifth harmonic generation system to generate high pulse energy 213nm laser from Q-switched Nd:YAG laser for LASIK application based on three stages harmonic generation procedures. A novel crystal housing was specifically designed to hold the three crystals with each crystal has independent, precise angular adjustment structure and automatic tuning control. The crystal temperature is well maintained at ~130°C to improve harmonic generation stability and crystal operation lifetime. An output pulse energy 35mJ is obtained at 213nm, corresponding to total conversion efficiency ~10% from 1064nm pump laser. In system verification tests, the 213nm output power drops less than 5% after 5 millions pulse shots and no significant damage appears in the crystals.

  7. 980 nm narrow linewidth Yb-doped phosphate fiber laser

    NASA Astrophysics Data System (ADS)

    Li, Pingxue; Yao, Yifei; Hu, Haowei; Chi, Junjie; Yang, Chun; Zhao, Ziqiang; Zhang, Guangju

    2014-12-01

    A narrow-linewidth ytterbium (Yb)-doped phosphate fiber laser based on fiber Bragg grating (FBG) operating around 980 nm is reported. Two different kinds of cavity are applied to obtain the 980 nm narrow-linewidth output. One kind of the cavity consists of a 0.35 nm broadband lindwidth high-reflection FBG and the Yb-doped phosphate fiber end with 0° angle, which generates a maximum output power of 25 mW. The other kind of resonator is composed of a single mode Yb-doped phosphate fiber and a pair of FBGs. Over 10.7 mW stable continuous wave are obtained with two longitudinal modes at 980 nm. We have given a detailed analysis and discussion for the results.

  8. Polarization properties of lidar scattering from clouds at 347 nm and 694 nm.

    PubMed

    Pal, S R; Carswell, A I

    1978-08-01

    The polarization characteristics of lidar scattering from cumulus and low-lying shower clouds have been measured with a system operating at 694 nm (red) and 347 nm (blue). The backscatter profiles of the polarization components as well as of the total intensity of the return are presented and discussed for the two wavelengths. The linear depolarization ratio delta, which can be used as a measure of the unpolarized multiple scattering, has been obtained at both wavelengths. This quantity has a very low value at cloud base for both wavelengths and increases with pulse penetration. The blue registers generally higher values of a within the cloud. The measured total intensity backscatter functions for both wavelengths are presented and discussed in relation to theoretical calculations of cloud models. PMID:20203781

  9. Efficient laser operation of Nd3+:Lu2O3 at various wavelengths between 917 nm and 1463 nm

    NASA Astrophysics Data System (ADS)

    von Brunn, P.; Heuer, A. M.; Fornasiero, L.; Huber, G.; Kränkel, C.

    2016-08-01

    Even though the first Nd3+-doped sesquioxide lasers have been realized more than 50 years ago, up to now no reports on efficient laser operation of Nd3+:doped sesquioxides can be found. In this work, we review the favorable spectroscopic properties of the sesquioxide Nd3+:Lu2O3 in terms of ground state absorption, stimulated emission, and excited state absorption cross sections as well as the upper level lifetime. Making use of these properties, we achieved efficient laser performance on eight different laser transitions in the wavelength range between 917 nm and 1463 nm under Ti:sapphire laser pumping using state-of-the-art HEM-grown Nd3+:Lu2O3 crystals with good optical quality. At the strongest transition around 1076 nm we determined a slope efficiency of 69%, which represents the highest efficiency ever obtained for a Nd3+-doped sesquioxide. Furthermore, we could generate watt level output powers and high slope efficiencies for seven other transitions. Lasers at 917 nm, 1053 nm, 1108 nm and 1463 nm were realized for the first time and the latter represents one of the longest laser wavelengths obtained on the 4F3/2  →  4I13/2 transition in Nd3+-doped materials.

  10. Obtaining and maintaining funding

    SciTech Connect

    Beverly Hartline

    1996-04-01

    Obtaining and maintaining funding is important for individuals, groups, institutions, and fields. This challenge is easier during times of abundant and growing resources than it is now, when funding is tight and shrinking. Thus, to obtain and maintain funding will require: maintaining healthy funding levels for all of science; maintaining healthy funding levels for the field(s) you work in; and competing successfully for the available funds. Everyone should pay attention to the overall prospects for science funding and dedicate some effort to working with others to grow the constituency for science. Public support is likely an important prerequisite for keeping future science budgets high. In this context, researchers should share with society at large the benefits of their research, so that taxpayers can see and appreciate some return from the federal investment in science. Assuming this effort is successful, and there continue to be government and private organizations with substantial resources to invest in research, what can the individual investigator do to improve her chances? She can be clear about her goal(s) and carefully plan her effort to make maximum progress for minimum resources, especially early in her career while she is establishing a solid professional reputation. Specific useful strategies include: brainstorm funding options and select the most promising one(s); be persistent but flexible, responsive to new information and changing circumstances; provide value and assistance to prospective funding sources both before and after receiving funding; know the funding agents and what their goals are, they are the customers; promise a lot and always deliver more; build partnerships and collaboration to leverage interest and resources; and develop capabilities and ideas with a promising, irresistible future. There is no guarantee of success. For the best chances, consistently contribute positively and productively in all your efforts, and continue to

  11. Sub-180 nm generation with borate crystal

    NASA Astrophysics Data System (ADS)

    Qu, Chen; Yoshimura, Masashi; Tsunoda, Jun; Kaneda, Yushi; Imade, Mamoru; Sasaki, Takatomo; Mori, Yusuke

    2014-10-01

    We demonstrated a new scheme for the generation of 179 nm vacuum-ultraviolet (VUV) light with an all-solid-state laser system. It was achieved by mixing the deep-ultraviolet (DUV) of 198.8 nm and the infrared (IR) of 1799.9 nm. While CsB3O5 (CBO) did not satisfy the phase-matching at around 180 nm, 179 nm output was generated with LiB3O5 (LBO) for the first time. The phase-matching property of LBO at around 180 nm was also investigated. There was small deviation from theoretical curve in the measurement, which is still considered reasonable.

  12. Electron beam inspection of 16nm HP node EUV masks

    NASA Astrophysics Data System (ADS)

    Shimomura, Takeya; Narukawa, Shogo; Abe, Tsukasa; Takikawa, Tadahiko; Hayashi, Naoya; Wang, Fei; Ma, Long; Lin, Chia-Wen; Zhao, Yan; Kuan, Chiyan; Jau, Jack

    2012-11-01

    EUV lithography (EUVL) is the most promising solution for 16nm HP node semiconductor device manufacturing and beyond. The fabrication of defect free EUV mask is one of the most challenging roadblocks to insert EUVL into high volume manufacturing (HVM). To fabricate and assure the defect free EUV masks, electron beam inspection (EBI) tool will be likely the necessary tool since optical mask inspection systems using 193nm and 199nm light are reaching a practical resolution limit around 16nm HP node EUV mask. For production use of EBI, several challenges and potential issues are expected. Firstly, required defect detection sensitivity is quite high. According to ITRS roadmap updated in 2011, the smallest defect size needed to detect is about 18nm for 15nm NAND Flash HP node EUV mask. Secondly, small pixel size is likely required to obtain the high sensitivity. Thus, it might damage Ru capped Mo/Si multilayer due to accumulated high density electron beam bombardments. It also has potential of elevation of nuisance defects and reduction of throughput. These challenges must be solved before inserting EBI system into EUV mask HVM line. In this paper, we share our initial inspection results for 16nm HP node EUV mask (64nm HP absorber pattern on the EUV mask) using an EBI system eXplore® 5400 developed by Hermes Microvision, Inc. (HMI). In particularly, defect detection sensitivity, inspectability and damage to EUV mask were assessed. As conclusions, we found that the EBI system has capability to capture 16nm defects on 64nm absorber pattern EUV mask, satisfying the sensitivity requirement of 15nm NAND Flash HP node EUV mask. Furthermore, we confirmed there is no significant damage to susceptible Ru capped Mo/Si multilayer. We also identified that low throughput and high nuisance defect rate are critical challenges needed to address for the 16nm HP node EUV mask inspection. The high nuisance defect rate could be generated by poor LWR and stitching errors during EB writing

  13. 147-nm photolysis of disilane

    SciTech Connect

    Perkins, G.G.A.; Lampe, F.W.

    1980-05-21

    The photodecomposition of Si/sub 2/H/sub 6/ at 147 nm results in the formation of H/sub 2/, SiH/sub 4/, Si/sub 3/H/sub 8/, Si/sub 4/H/sub 10/, Si/sub 5/H/sub 12/, and a solid film of amorphous silicon hydride (a-Si:H). Three primary processes are proposed to account for the results, namely, (a) Si/sub 2/H/sub 6/ + h..nu.. ..-->.. SiH/sub 2/ + SiH/sub 3/ + H (phi/sub a/ = 0.61); (b) Si/sub 2/H/sub 6/ + h..nu.. ..-->.. SiH/sub 3/SiH + 2H (phi/sub b/ = 0.18); (c) Si/sub 2/H/sub 6/ + h..nu.. ..-->.. Si/sub 2/H/sub 5/ + H (phi/sub c/ = 0.21). The overall quantum yields depend on the pressure but at 1 Torr partial pressure of Si/sub 2/H/sub 6/ are PHI(-Si/sub 2/H/sub 6/) = 4.3 +- 0.2, PHI(SiH/sub 4/) = 1.2 +- 0.4, PHI(Si/sub 3/H/sub 8/) = 0.91 +- 0.08, PHI(Si/sub 4/H/sub 10/) = 0.62 +- 0.03, PHI(Si,wall) = 2.2. Quantum yields for H/sub 2/ formation were not measured. A mechanism is proposed which is shown to be in accord with the experimental facts.

  14. Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography

    NASA Astrophysics Data System (ADS)

    Dammel, Ralph R.; Sakamuri, Raj; Lee, Sang-Ho; Rahman, Dalil; Kudo, Takanori; Romano, Andrew R.; Rhodes, Larry F.; Lipian, John-Henry; Hacker, Cheryl; Barnes, Dennis A.

    2002-07-01

    The copolymerization reaction between methyl cyanoacrylate (MCA) and a variety of cycloolefins (CO) was investigated. Cycololefin/cyanoacrylate (COCA) copolymers were obtained in good yields and with lithographically interesting molecular weights for all cycoolefins studied. Anionic MCA homopolymerization could be largely suppressed using acetic acid. Based on NMR data, the copolymerization may tend to a 1:1 CO:MCA incorporation ratio but further work with better suppression of the anionic component is needed to confirm this. Lithographic tests on copolymers of appropriately substituted norbornenes and MCA showed semi-dense and isolated line performance down to 90 nm.

  15. Modeling the distributed gain of single--(1050 or 1410 nm) and dual-wavelength--(800 + 1050 nm or 800 + 1410 nm) pumped thulium-doped fiber amplifiers.

    PubMed

    Floridia, Claudio; Carvalho, M T; Lüthi, S R; Gomes, A S L

    2004-09-01

    The distributed gain of single- and dual-wavelength-pumped thulium-doped fiber amplifiers is modeled. The excellent agreement between the model and coherent optical frequency domain reflectometry measurements enables us to estimate intrinsic loss, branching ratios of fluorescence originating from the 3H4 level, and cross sections of upconversion pumping at 1050 and 1410 nm for the Tm3+ ions in the fiber. With the branching ratios obtained it is possible to describe induced signal absorption when pumping at 800 nm. PMID:15455754

  16. Fiber-integrated 780 nm source for visible parametric generation.

    PubMed

    Hu, D J J; Murray, R T; Legg, T; Runcorn, T H; Zhang, M; Woodward, R I; Lim, J L; Wang, Y; Luan, F; Gu, B; Shum, P P; Kelleher, E J R; Popov, S V; Taylor, J R

    2014-12-01

    We report the development of a fully fiber-integrated pulsed master oscillator power fibre amplifier (MOPFA) source at 780 nm, producing 3.5 W of average power with 410 ps pulses at a repetition rate of 50 MHz. The source consists of an intensity modulated 1560 nm laser diode amplified in an erbium fiber amplifier chain, followed by a fiber coupled periodically poled lithium niobate crystal module for frequency doubling. The source is then used for generating visible light through four-wave mixing in a length of highly nonlinear photonic crystal fiber: 105 mW at 668 nm and 95 mW at 662 nm are obtained, with pump to anti-Stokes conversion slope efficiencies exceeding 6% in both cases. PMID:25606903

  17. Electro-optically Q-switched dual-wavelength Nd:YLF laser emitting at 1047 nm and 1053 nm

    NASA Astrophysics Data System (ADS)

    Men, Shaojie; Liu, Zhaojun; Cong, Zhenhua; Li, Yongfu; Zhang, Xingyu

    2015-05-01

    A flash-lamp pumped electro-optically Q-switched dual-wavelength Nd:YLF laser is demonstrated. Two Nd:YLF crystals placed in two cavities are employed to generate orthogonally polarized 1047 nm and 1053 nm radiations, respectively. The two cavities are jointed together by a polarizer and share the same electro-optical Q-switch. Two narrow-band pass filters are used to block unexpected oscillations at the hold-off state of the electro-optical Q-switch. In this case, electro-optical Q-switching is able to operate successfully. With pulse synchronization realized, the maximum output energy of 66.2 mJ and 83.9 mJ are obtained for 1047 nm and 1053 nm lasers, respectively. Correspondingly, the minimum pulse width is both 17 ns for 1047 nm and 1053 nm lasers. Sum frequency generation is realized. This demonstrates the potential of this laser in difference-frequency generations to obtain terahertz wave.

  18. High-resolution optical signatures of fresh and aged explosives in the 420nm to 620nm illumination range

    NASA Astrophysics Data System (ADS)

    Lunsford, Robert; Grun, Jacob; Gump, Jared

    2012-06-01

    Optical signatures of fresh and aged explosives are measured and compared to determine whether there exist differences in the signatures that can be exploited for detection. The explosives examined are RDX, TNT, and HMX, which have been heated for two weeks at 75 degrees centigrade or irradiated for two weeks with a 15-Watt ultraviolet lamp (254nm). The optical signatures are obtained by illuminating the samples with a sequence of laser wavelengths between 420nm and 620nm in 10 nm steps and measuring the spectra of light scattered from the sample at each laser wavelength. The measurements are performed on the Naval Research Laboratory's SWOrRD instrument. SWOrRD is capable of illuminating a sample with laser wavelength between 210nm and 2000nm, in steps of 0.1nm, and measuring the spectrum of light scattered from the sample at each wavelength. SWOrRD's broad tuning range, high average power (1- 300mW), narrow line width (< 4cm-1), and rapid wavelength tunability enable these measurements. Results, based on more than 80 measurements - each at 21 sequential laser wavelengths, indicate that the variation in spectral line amplitude observed when altering laser illumination wavelength differs between fresh and aged explosives. Thus, an instrument for rapid and reagent-less differentiation between aged and fresh explosives, based on illumination with a few appropriately chosen laser wavelengths appears feasible.

  19. Measurements of Photoabsorpton Cross Sections and their Temperature Dependence for CO2 in the 170nm to 200nm Region

    NASA Astrophysics Data System (ADS)

    Parkinson, W. H.; Yoshino, K.

    2001-11-01

    All the photochemical models for the predominately CO2 Martian atmosphere ar e very sensitive to the amount of CO2 and to the values and spectral details of the absorpton cross sections of CO2 in the region 170nm-200nm. Earlier we had measured and published absolute cross sections of CO2 in the region 118.0 nm-175.5 nm at 295K and 195K. We have recently extended these measurements from 170 nm to 200 nm at 300K and 1 95K. The new measurements have been carried out at high resolution with our 6.65 -m normal incidence , photoelectric spectrometer. To measure the weak photoabsorption of the CO2 bands in the wavelength region 170 --200 nm, we required a high column density of the gas. We obtained this by using a multi pass technique, a White cell. The White cell was designed to have a distance of 1.50 m between two main mirrors, and was set for four, double pas ses making a path length of 12.0 m. CO2 gas was frozen in a stainless cylinder immersed in liquid nitrogen, and t he frozen product (dryice) was pumped by the diffusion pump for purification. The CO2 was warmed up slowly and kept in the cylinder at high pressure. The CO2 pressure used in the White cell was varied from 1 to 1000 Torr depend ing on the wavelength region, and was measured with a a capacitance manometer (M KS Baratron, 10 Torr and 1000 Torr). We divided the spectral region into twenty sections of about 1.5 nm extent. At each scan range, another scan was obtained from the emission spectrum of the fourth positive bands of CO for wavelength calibration. We acknowledge funding from NASA, grant NAGS-7859 to Harvard College Observatory.

  20. Tissue measurement using 1064 nm dispersive Raman spectroscopy

    NASA Astrophysics Data System (ADS)

    Lieber, Chad A.; Wu, Huawen; Yang, William

    2013-03-01

    The use of Raman spectroscopy to provide characterization and diagnosis of biological tissues has shown increasing success in recent years. Most of this work has been performed using near-infrared laser sources such as 785 or 830 nm, in a balance of reduced intrinsic fluorescence in the tissues and quantum efficiency in the silicon detectors often used. However, even at these wavelengths, many tissues still exhibit strong or prohibitive fluorescence, and these wavelengths still cause autofluorescence in many common sampling materials, such as glass. In this study, we demonstrate the use of 1064 nm dispersive Raman spectroscopy for the study of biological tissues. A number of tissues are evaluated using the 1064 nm system and compared with the spectra obtained from a 785 nm system. Sampling materials are similarly compared. These results show that 1064 nm dispersive Raman spectroscopy provides a viable solution for measurement of highly fluorescent biological tissues such as liver and kidney, which are difficult or impossible to extract Raman at 785 nm.

  1. Efficient 1061 and 1329 nm laser emission of Nd:CNGG lasers under 885 nm diode pumping into the emitting level

    NASA Astrophysics Data System (ADS)

    Li, Y. L.; Jiang, H. L.; Ni, T. Y.; Zhang, T. Y.; Tao, Z. H.; Zeng, Y. H.

    2011-03-01

    We report an efficiency Nd:CNGG laser operating at 1061 and 1329 nm, respectively, direct pumped by a diode laser at 885 nm for the first time to our knowledge. The maximum outputs of 4.5 and 2.9 W, at 1061 and 1329 nm, respectively, are obtained in a 6-mm-thick 0.5 at % Nd:CNGG crystal with 13.5 W of absorbed pump power at 885 nm, leading to a high slope efficiency with respect to the absorbed pump power of 32.2 and 22.1%. Under traditional pumping at 808 nm, the maximum outputs of 3.9 and 2.7 W, at 1061 and 1329 nm, respectively, are obtained with 15.4 W of absorbed pump power, corresponding to the slope efficiency with respect to the absorbed pump power of 25.2 and 17.9%.

  2. 1053-nm all-fiber multi-pulse phase modulator for chirped pulse amplification

    NASA Astrophysics Data System (ADS)

    Jing, Yuanyuan; Wang, Xiaochao; Fan, Wei; Qiao, Zhi; Chen, Xin

    2016-01-01

    An all-fiber multi-pass phase modulator for chirped pulse amplification centered at 1053nm is demonstrated. An optical pulse with a 3-dB bandwidth of 2.23nm centered at 1053 nm is obtained based on the system. And spectrum with negative dispersion is obtain by an all-fiber architecture which can be used for ultrashort laser source in ps.

  3. Surface Photometry of the Southern Milky Way at 170 NM

    NASA Astrophysics Data System (ADS)

    Hansen, J.; Schlosser, W.; Schmidtobreick, L.; Koczet, P.

    As part of the D2-Space-Shuttle-Mission in 1993, the GAUSS-Camera has obtained photographic images of the Milky Way in various passbands in the Ultraviolet. Each film covers an area of the sky of about 140^\\circ. Six images were obtained at 170 nm, but only three of them could be used. The calibration has been done using the catalogued intensities of stars and transforming them into surface brightnesses. Then the stars on the images have been filtered out and the Shuttle-Glow has been eliminated. The images finally have been transformed into maps of the Milky Way in galactic coordinates l, b. These maps cover the Milky Way between the Galactic Center and Vela (360^\\circ <= l <= 270^\\circ, - -25^\\circ <= b <= 35^\\circ) and include dark clouds, reflection nebulae and bright open clusters. They are a perfect tool to investigate the distribution of these objects and therefore the global structure of the Milky Way. The image of the Milky Way at 170 nm is heavily dominated by interstellar extinction, leading to high intensity gradients all over the galactic plane. The images at 217 nm and 280 nm, also obtained by the GAUSS-Camera, and previous photometries taken in U, B, V and R have been used for comparison.

  4. Imaging performance and challenges of 10nm and 7nm logic nodes with 0.33 NA EUV

    NASA Astrophysics Data System (ADS)

    van Setten, Eelco; Schiffelers, Guido; Psara, Eleni; Oorschot, Dorothe; Davydova, Natalia; Finders, Jo; Depre, Laurent; Farys, Vincent

    2014-10-01

    The NXE:3300B is ASML's third generation EUV system and has an NA of 0.33 and is positioned at a resolution of 22nm, which can be extended down to 18nm and below with off-axis illumination at full transmission. Multiple systems have been qualified and installed at customers. The NXE:3300B succeeds the NXE:3100 system (NA of 0.25), which has allowed customers to gain valuable EUV experience. It is expected that EUV will be adopted first for critical Logic layers at 10nm and 7nm nodes, such as Metal-1, to avoid the complexity of triple patterning schemes using ArF immersion. In this paper we will evaluate the imaging performance of (sub-)10nm node Logic M1 on the NXE:3300B EUV scanner. We will show the line-end performance of tip-to-tip and tip-to-space test features for various pitches and illumination settings and the performance enhancement obtained by means of a 1st round of OPC. We will also show the magnitude of local variations. The Logic M1 cell is evaluated at various critical features to identify hot spots. A 2nd round OPC model was calibrated of which we will show the model accuracy and ability to predict hot spots in the Logic M1 cell. The calibrated OPC model is used to predict the expected performance at 7nm node Logic using off-axis illumination at 16nm minimum half pitch. Initial results of L/S exposed on the NXE:3300B at 7nm node resolutions will be shown. An outlook is given to future 0.33 NA systems on the ASML roadmap with enhanced illuminator capabilities to further improve performance and process window.

  5. Flux-calibration of medium-resolution spectra from 300 nm to 2500 nm

    NASA Astrophysics Data System (ADS)

    Moehler, Sabine; Modigliani, Andrea; Freudling, Wolfram; Giammichele, Noemi; Gianninas, Alexandros; Gonneau, Anais; Kausch, Wolfgang; Lançon, Ariane; Noll, Stefan; Rauch, Thomas; Vinther, Jakob

    2014-08-01

    While the near-infrared wavelength regime is becoming more and more important for astrophysics there are few spectrophotometric standard star data available to flux calibrate such data. On the other hand flux calibrating high-resolution spectra is a challenge even in the optical wavelength range, because the available flux standard data are often too coarsely sampled. We describe a method to obtain reference spectra derived from stellar model atmospheres, which allow users to derive response curves from 300 nm to 2500 nm also for high-resolution spectra. We verified that they provide an appropriate description of the observed standard star spectra by checking for residuals in line cores and line overlap regions in the ratios of observed spectra to model spectra. The finally selected model spectra are then empirically corrected for remaining mismatches and photometrically calibrated using independent observations. In addition we have defined an automatic method to correct for moderate telluric absorption using telluric model spectra with very high spectral resolution, that can easily be adapted to the observed data. This procedure eliminates the need to observe telluric standard stars, as long as some knowledge on the target spectrum exists.

  6. Novel EUV resist development for sub-14nm half pitch

    NASA Astrophysics Data System (ADS)

    Hori, Masafumi; Naruoka, Takehiko; Nakagawa, Hisashi; Fujisawa, Tomohisa; Kimoto, Takakazu; Shiratani, Motohiro; Nagai, Tomoki; Ayothi, Ramakrishnan; Hishiro, Yoshi; Hoshiko, Kenji; Kimura, Toru

    2015-03-01

    Extreme ultraviolet (EUV) lithography has emerged as a promising candidate for the manufacturing of semiconductor devices at the sub-14nm half pitch lines and spaces (LS) pattern for 7 nm node and beyond. The success of EUV lithography for the high volume manufacturing of semiconductor devices depends on the availability of suitable resist with high resolution and sensitivity. It is well-known that the key challenge for EUV resist is the simultaneous requirement of ultrahigh resolution (R), low line edge roughness (L) and high sensitivity (S). In this paper, we investigated and developed new chemically amplified resist (CAR) materials to achieve sub-14 nm hp resolution. We found that both resolution and sensitivity were improved simultaneously by controlling acid diffusion length and efficiency of acid generation using novel PAG and sensitizer. EUV lithography evaluation results obtained for new CAR on Micro Exposure Tool (MET) and NXE3300 system are described and the fundamentals are discussed.

  7. Cycloolefin-maleic anhydride copolymers for 193-nm resist compositions

    NASA Astrophysics Data System (ADS)

    Rahman, M. D.; Bae, Jun-Bom; Cook, Michelle M.; Durham, Dana L.; Kudo, Takanori; Kim, Woo-Kyu; Padmanaban, Munirathna; Dammel, Ralph R.

    2000-06-01

    Cycloolefin/maleic anhydride systems are a favorable approach to dry etch resistant resists for 193 nm lithography. This paper reports on poly(BNC/HNC/NC/MA) tetrapolymers, from t- butylnorbornene carboxylate (BNC), hydroxyethyl-norbornene carboxylate (HNC), norbornene carboxylic acid (NC) and maleic anhydride (MA). It was found that moisture has to be excluded in the synthesis of these systems if reproducible results are to be obtained. Lithographic evaluation of an optimized, modified polymer has shown linear isolated line resolution down to 100 nm using conventional 193 nm illumination. Possible reactions of the alcohol and anhydride moieties are discussed, and the effect of the anhydride unit on polymer absorbance is discussed using succinnic anhydride as a model compound.

  8. Diode laser pumped blue-light source at 473 nm using intracavity frequency doubling of a 946 nm Nd:YAG laser

    SciTech Connect

    Risk, W.P.; Pon, R.; Lenth, W.

    1989-04-24

    Using intracavity frequency doubling of a diode laser pumped 946 nm Nd:YAG laser, 3.1 mW of blue output power at 473 nm was obtained. Angle-tuned, type-I frequency doubling in potassium niobate was employed, and both the KNbO/sub 3/ and Nd:YAG crystals were used at room temperature.

  9. Considerations for fine hole patterning for the 7nm node

    NASA Astrophysics Data System (ADS)

    Yaegashi, Hidetami; Oyama, Kenichi; Hara, Arisa; Natori, Sakurako; Yamauchi, Shohei; Yamato, Masatoshi; Koike, Kyohei

    2016-03-01

    One of the practical candidates to produce 7nm node logic devices is to use the multiple patterning with 193-immersion exposure. For the multiple patterning, it is important to evaluate the relation between the number of mask layer and the minimum pitch systematically to judge the device manufacturability. Although the number of the time of patterning, namely LE(Litho-Etch) ^ x-time, and overlay steps have to be reduced, there are some challenges in miniaturization of hole size below 20nm. Various process fluctuations on contact hole have a direct impact on device performance. According to the technical trend, 12nm diameter hole on 30nm-pitch hole will be needed on 7nm node. Extreme ultraviolet lithography (EUV) and Directed self-assembly (DSA) are attracting considerable attention to obtain small feature size pattern, however, 193-immersion still has the potential to extend optical lithography cost-effectively for sub-7nm node. The objective of this work is to study the process variation challenges and resolution in post-processing for the CD-bias control to meet sub-20nm diameter contact hole. Another pattern modulation is also demonstrated during post-processing step for hole shrink. With the realization that pattern fidelity and pattern placement management will limit scaling long before devices and interconnects fail to perform intrinsically, the talk will also outline how circle edge roughness (CER) and Local-CD uniformity can correct efficiency. On the other hand, 1D Gridded-Design-Rules layout (1D layout) has simple rectangular shapes. Also, we have demonstrated CD-bias modification on short trench pattern to cut grating line for its fabrication.

  10. Switching Properties of sub-100 nm Perpendicular Magnetic Tunnel Junctions

    NASA Astrophysics Data System (ADS)

    Tryputen, Larysa; Piotrowski, Stephan; Bapna, Mukund; Chien, Chia-Ling; Wang, Weigang; Majetich, Sara; Ross, Caroline

    2015-03-01

    Perpendicular magnetic tunnel junctions (p-MTJs) have great potential for realizing high-density non-volatile memory and logic devices. It is critical to solve scalability problem to implement such devices, to achieve low resistance area and to reduce switching current density while maintaining thermal stability. We present our recent results on fabrication of high resolution Ta/CoFeB/MgO/CoFeB/Ta p-MTJ devices and characterization of their switching properties as well as topography and current mapping by using nanoscale Conductive Atomic Force Microscopy. Our patterning method is based on using hydrogen silsesquioxane resist mask combined with ion beam etching. It allows to fabricate p-MTJ devices down to 40 nm in diameter while maintaining the magnetic quality of the multilayers. Repeatable, consistent switching behaviour has been observed in the obtained p-MTJ devices of 500 nm down to 40 nm with 10 - 800 mV voltage applied. Switching field increased as device diameter decreased, from 580 Oe at 500 nm (MR = 10%) to 410 Oe at 80 nm (MR = 9%). We discuss the effect of device sizes on the switching properties. This work was supported in part by C-SPIN, one of the six centers of STARnet, a Semiconductor Research Corporation Program sponsored by MARCO and DARPA and in part through the National Science Foundation through NCN-Needs Program, Contract 12207020-EEC.

  11. Coronal Diagnostics from Narrowband Images Around 30.4 nm

    NASA Astrophysics Data System (ADS)

    Andretta, V.; Telloni, D.; Del Zanna, G.

    2012-07-01

    Images taken in the band centered at 30.4 nm are routinely used to map the radiance of the He ii Ly α line on the solar disk. That line is one of the strongest, if not the strongest, line in the EUV observed in the solar spectrum, and one of the few lines in that wavelength range providing information on the upper chromosphere or lower transition region. However, when observing the off-limb corona, the contribution from the nearby Si xi 30.3 nm line can become significant. In this work we aim at estimating the relative contribution of those two lines in the solar corona around the minimum of solar activity. We combine measurements from CDS taken in August 2008 with temperature and density profiles from semiempirical models of the corona to compute the radiances of the two lines, and of other representative coronal lines ( e.g. Mg x 62.5 nm, Si xii 52.1 nm). Considering both diagnosed quantities from line ratios (temperatures and densities) and line radiances in absolute units, we obtain a good overall match between observations and models. We find that the Si xi line dominates the He ii line from just above the limb up to ≈ 2 R ⊙ in streamers, while its contribution to narrowband imaging in the 30.4 nm band is expected to become smaller, even negligible in the corona beyond ≈ 2 - 3 R ⊙, the precise value being strongly dependent on the coronal temperature profile.

  12. Simultaneous triple 914 nm, 1084 nm, and 1086 nm operation of a diode-pumped Nd:YVO4 laser

    NASA Astrophysics Data System (ADS)

    Lü, Yanfei; Xia, Jing; Liu, Huilong; Pu, Xiaoyun

    2014-10-01

    We report a diode-pumped continuous-wave (cw) triple-wavelength Nd:YVO4 laser operating at 914, 1084, and 1086 nm. A theoretical analysis has been introduced to determine the threshold conditions for simultaneous triple-wavelength laser. Using a T-shaped cavity, we realized an efficient triple-wavelength operation at 4F3/2→4I9/2 and 4F3/2→4I11/2 transitions for Nd:YVO4 crystal, simultaneously. At an absorbed pump power of 16 W (or 25 W of incident pump power), the maximum output power was 2.3 W, which included 914 nm, 1084 nm, and 1086 nm three wavelengths, and the optical conversion efficiency with respect to the absorbed pump power was 14.4%.

  13. A tunable, Nd-doped lithium niobate laser at 1084 nm

    SciTech Connect

    Schearer, L.D. ); Leduc, M.

    1988-10-01

    Over 250 mW of CW laser emission at 1084 nm is obtained from Nd:LiNbO{sub 3} when the rod is end-pumped along the crystalline {open quote}{ital y}{close quote} axis by 1 W from a Kr{sup +} laser at 752 nm. The laser can be tuned over 3 nm at the 1084 nm peak with a thin, uncoated etalon in the cavity. Thresholds of 30 mW of absorbed pump power were obtained with a weak output coupler, rising to 220 mW with a 35% transmitting output mirror. No pump-induced photorefractive effects were observed.

  14. Sub-10 nm nanopantography

    SciTech Connect

    Tian, Siyuan Donnelly, Vincent M. E-mail: economou@uh.edu; Economou, Demetre J. E-mail: economou@uh.edu; Ruchhoeft, Paul

    2015-11-09

    Nanopantography, a massively parallel nanopatterning method over large areas, was previously shown to be capable of printing 10 nm features in silicon, using an array of 1000 nm-diameter electrostatic lenses, fabricated on the substrate, to focus beamlets of a broad area ion beam on selected regions of the substrate. In the present study, using lens dimensional scaling optimized by computer simulation, and reduction in the ion beam image size and energy dispersion, the resolution of nanopantography was dramatically improved, allowing features as small as 3 nm to be etched into Si.

  15. CMOS downsizing toward sub-10 nm

    NASA Astrophysics Data System (ADS)

    Iwai, Hiroshi

    2004-04-01

    Recently, CMOS downsizing has been accelerated very aggressively in both production and research level, and even transistor operation of a 6 nm gate length p-channel MOSFET was reported in a conference. However, many serious problems are expected for implementing such small-geometry MOSFETs into large scale integrated circuits, and it is still questionable whether we can successfully introduce sub-10 nm CMOS LSIs into the market or not. In this paper, limitation and its possible causes for the downscaling of CMOS towards sub-10 nm are discussed with consideration of past CMOS predictions for the limitation.

  16. Fabrication of 10nm diameter carbon nanopores

    SciTech Connect

    Radenovic, Aleksandra; Trepagnier, Eliane; Csencsits, Roseann; Downing, Kenneth H; Liphardt, Jan

    2008-09-25

    The addition of carbon to samples, during imaging, presents a barrier to accurate TEM analysis, the controlled deposition of hydrocarbons by a focused electron beam can be a useful technique for local nanometer-scale sculpting of material. Here we use hydrocarbon deposition to form nanopores from larger focused ion beam (FIB) holes in silicon nitride membranes. Using this method, we close 100-200nm diameter holes to diameters of 10nm and below, with deposition rates of 0.6nm per minute. I-V characteristics of electrolytic flow through these nanopores agree quantitatively with a one dimensional model at all examined salt concentrations.

  17. Laser Damage Growth in Fused Silica with Simultaneous 351 nm and 1053 nm irradiation

    SciTech Connect

    Norton, M A; Carr, A V; Carr, C W; Donohue, E E; Feit, M D; Hollingsworth, W G; Liao, Z; Negres, R A; Rubenchik, A M; Wegner, P J

    2008-10-24

    Laser-induced growth of optical damage often determines the useful lifetime of an optic in a high power laser system. We have extended our previous work on growth of laser damage in fused silica with simultaneous 351 nm and 1053 nm laser irradiation by measuring the threshold for growth with various ratios of 351 nm and 1053 nm fluence. Previously we reported that when growth occurs, the growth rate is determined by the total fluence. We now find that the threshold for growth is dependent on both the magnitude of the 351 nm fluence as well as the ratio of the 351 nm fluence to the 1053 nm fluence. Furthermore, the data suggests that under certain conditions the 1053 nm fluence does not contribute to the growth.

  18. 1 W of 261 nm cw generation in a Pr 3+:LiYF 4 laser pumped by an optically pumped semiconductor laser at 479 nm

    NASA Astrophysics Data System (ADS)

    Ostroumov, Vasiliy; Seelert, Wolf

    2008-02-01

    The lack of blue pump sources for Pr-doped materials has been overcome with the recent progress in optically pumped semiconductor lasers (OPS) operating at 479 nm. The availability of reliable high power OPS pump lasers, makes Pr 3+-doped crystals ideal gain media for compact and efficient ultraviolet solid-state lasers with output power in the Watt range. We report on the scalability of a 522/261 nm Pr:YLF cw laser that is dual-end-pumped by two OPS lasers at 479 nm. At 9.6 W of incident pump power more than 4 W were obtained at 522 nm with a slope efficiency of 45%. Intracavity frequency doubling of 522 nm resulted in 1 Watt of cw UV output at 261 nm.

  19. 308nm excimer laser in dermatology.

    PubMed

    Mehraban, Shadi; Feily, Amir

    2014-01-01

    308nm xenon-chloride excimer laser, a novel mode of phototherapy, is an ultraviolet B radiation system consisting of a noble gas and halide. The aim of this systematic review was to investigate the literature and summarize all the experiments, clinical trials and case reports on 308-nm excimer laser in dermatological disorders. 308-nm excimer laser has currently a verified efficacy in treating skin conditions such as vitiligo, psoriasis, atopic dermatitis, alopecia areata, allergic rhinitis, folliculitis, granuloma annulare, lichen planus, mycosis fungoides, palmoplantar pustulosis, pityriasis alba, CD30+ lympho proliferative disorder, leukoderma, prurigo nodularis, localized scleroderma and genital lichen sclerosus. Although the 308-nm excimer laser appears to act as a promising treatment modality in dermatology, further large-scale studies should be undertaken in order to fully affirm its safety profile considering the potential risk, however minimal, of malignancy, it may impose. PMID:25606333

  20. Optical extension at the 193-nm wavelength

    NASA Astrophysics Data System (ADS)

    Zandbergen, Peter; McCallum, Martin; Amblard, Gilles R.; Domke, Wolf-Dieter; Smith, Bruce W.; Zavyalova, Lena; Petersen, John S.

    1999-07-01

    Lithography at 193nm is the first optical lithography technique that will be introduced for manufacturing of technology levels. where the required dimensions are smaller than the actual wavelength. This paper explores several techniques to extend 193nm to low k1 lithography. Most attention is given to binary mask solution in at 130nm dimensions, where k1 is 0.4. Various strong and Gaussian quadrupole illuminators were designed, manufactured and tested for this application. Strong quadrupoles show that largest DOF improvements. The drawback however, is that these strong quadrupoles are very duty cycle and dimensions specific, resulting in large proximity biases between different duty cycles. Due to their design, Gaussian quadrupoles sample much wider frequency ranges, resulting in less duty cycles specific DOF improvements and less proximity basis. At sub-130nm dimensions, strong phase shift masks provide significant latitude improvements, when compared to binary masks with quadrupole illumination. However, differences in dose to size for different duty cycles were up to 25 percent. For definition of contact holes, linewidth biasing through silylation, a key feature of the CARL bi-layer resist approach, demonstrated significant DOF latitude improvements compared to SLR at 140nm and 160nm contact holes.

  1. New electron optics for mask writer EBM-7000 to challenge hp 32nm generation

    NASA Astrophysics Data System (ADS)

    Kamikubo, Takashi; Golladay, Steven; Kendall, Rodney; Katsap, Victor; Ohtoshi, Kenji; Ogasawara, Munehiro; Nishimura, Shinsuke; Nishimura, Rieko; Iizuka, Osamu; Nakayama, Takahito; Shinkawa, Shunji; Nishiyama, Tetsurou; Tamamushi, Shuichi

    2008-10-01

    Semiconductor scaling is expected to continue to hp32nm and beyond, accompanied by explosive data volume expansion. Required minimum feature size at hp 32nm will be less than 50nm on the mask, according to ITRS2007(1). EBM 7000 is a newly designed mask writer for the hp32 nm node with an improved electron optical column providing the beam resolution (10 nm measured in situ) and beam current density (200 A/cm2) necessary for cost effective mask production at hp32nm node. In this paper we report on column improvements, the in situ beam blur measurement method and writing results from EBM 7000. Written patterns show dose margin (CD change [nm] / 1 % dose change) of .94 nm /1 % dose for line/space arrays using chemically amplified resist PRL009 and our standard processing. Using a simple model to relate the measured beam intensity distribution to the measured dose margin, we infer an effective total blur of 30 nm, dominated by a contribution of 28 nm from the resist exposure and development process. Further evidence of the dominance of the process contribution is the measured improvement in dose margin to .64 nm/% dose obtained by modifying our standard process. Even larger process improvements will be needed for successful fabrication of hp22nm masks.

  2. The Double-ended 750 nm and 532 nm Laser Output from PPLN-FWM

    NASA Astrophysics Data System (ADS)

    Wang, Tao; Li, Yu-Xiang; Yao, Jian-Quan; Guo, Ling; Wang, Zhuo; Han, Sha-Sha; Zhang, Cui-Ying; Zhong, Kai

    2013-06-01

    We investigate 750 nm and 532 nm dual-wavelength laser for applications in the internet of things. A kind of optical maser is developed, in which the semiconductor module outputs the 808 nm pump light and then it goes into a double-clad Nd3+ :YAG monocrystal optical fiber through the intermediate coupler and forms a 1064 nm laser. The laser outputs come from both left and right terminals. In the right branch, the laser goes into the right cycle polarization LinNbO3 (PPLN) crystal through the right coupler, produces the optical parametric oscillation and forms the signal light λ1 (1500 nm), the idle frequency light λ2 (3660.55 nm), and the second-harmonic of the signal light λ3 (750 nm). These three kinds of light and the pump light λ4 together form the frequency matching and the quasi-phase matching, then the four-wave mixing occurs to create the high-gain light at wavelength 750 nm. Meanwhile, in the left branch, the laser goes into the left PPLN crystal through the left coupler, engenders frequency doubling and forms the light at wavelength 532 nm. That is to say, the optical maser provides 750 nm and 532 nm dual-wavelength laser outputting from two terminals, which is workable.

  3. Sub-15nm patterning technology using directed self-assembly on nano-imprinting guide

    NASA Astrophysics Data System (ADS)

    Morita, Seiji; Kanno, Masahiro; Yamamoto, Ryousuke; Sasao, Norikatsu; Sugimura, Shinobu

    2016-04-01

    In next generation lithography to make sub-15nm pattern, Directed self-assembly (DSA) and Nano-imprint lithography (NIL) are proposed. The current DSA process is complicated and it is difficult to decrease width and line edge roughness of a guide pattern for sub-15nm patterning. In the case of NIL, it is difficult to make the master template having sub- 15nm pattern. This paper describes cost-effective lithography process for making sub-15nm pattern using DSA on a guide pattern replicated by Nano-imprinting (NIL + DSA). Simple process for making sub-15nm pattern is proposed. The quartz templates are made and line/space patterns of half pitch (hp) 12nm and hp9.5nm are obtained by NIL + DSA.

  4. INITIAL GAIN MEASUREMENTS OF A 800 NM SASE FEL, VISA.

    SciTech Connect

    FRIGOLA,P.; MUROKH,A.; ET AL; BABZIEN,M.; BEN-ZVI,I.; JOHNSON,E.; MALONE,R.

    2000-08-13

    The VISA (Visible to Infrared SASE Amplifier) FEL is designed to obtain high gain at a radiation wavelength of 800nm. The FEL uses the high brightness electron beam of the Accelerator Test Facility (ATF), with energy of 72MeV. VISA uses a novel, 4 m long, strong focusing undulator with a gap of 6mm and a period of 1.8cm. To obtain large gain the beam and undulator axis have to be aligned to better than 50{micro}m. Results from initial measurements on the alignment, gain, and spectrum will be presented and compared to theoretical calculations and simulations.

  5. Initial Gain Measurements of a 800nm SASE FEL, VISA

    SciTech Connect

    Carr, Roger

    2002-08-14

    The VISA (Visible to Infrared SASE Amplifier) FEL is designed to obtain high gain at a radiation wavelength of 800nm. The FEL uses the high brightness electron beam of the Accelerator Test Facility (ATF), with energy of 72MeV. VISA uses a novel, 4 m long, strong focusing undulator with a gap of 6mm and a period of 1.8cm. To obtain large gain the beam and undulator axis have to be aligned to better than 50{micro}m. Results from initial measurements on the alignment, gain, and spectrum will be presented and compared to theoretical calculations and simulations.

  6. Initial gain measurements of an 800 nm SASE FEL, VISA

    NASA Astrophysics Data System (ADS)

    Frigola, P.; Murokh, A.; Musumeci, P.; Pellegrini, C.; Reiche, S.; Rosenzweig, J.; Tremaine, A.; Babzien, M.; Ben-Zvi, I.; Johnson, E.; Malone, R.; Rakowsky, G.; Skaritka, J.; Wang, X. J.; Van Bibber, K. A.; Bertolini, L.; Hill, J. M.; Le Sage, G. P.; Libkind, M.; Toor, A.; Carr, R.; Cornacchia, M.; Klaisner, L.; Nuhn, H.-D.; Ruland, R.; Nguyen, D. C.

    2001-12-01

    The Visible to Infrared SASE Amplifier (VISA) FEL is designed to obtain high gain at a radiation wavelength of 800 nm. The FEL uses the high brightness electron beam of the Accelerator Test Facility (ATF), with energy of 72 MeV. VISA uses a novel, 4 m long, strong focusing undulator with a gap of 6 mm and a period of 1.8 cm. To obtain large gain the beam and undulator axis have to be aligned to better than 5 μm. Results from initial measurements on the alignment, gain, and spectrum will be presented and compared to theoretical calculations and simulations.

  7. Photoabsorption cross sections of OH at 115-183 nm

    NASA Technical Reports Server (NTRS)

    Nee, J. B.; Lee, L. C.

    1984-01-01

    The absorption spectrum for OH was obtained in the 115-183 nm region. The OH radicals were produced by a pulse discharge of trace H2O in few torr of Ar. Absorption cross sections were obtained by calibration with absorption of the OH (X 2 Pi to A 2 Sigma +) transition. The features in the absorption spectrum are correlated with the excited states 1 2 Sigma -, D 2 Sigma -, 1 2 Delta, B 2 Sigma + and possibly others calculated by van Dishoeck, Langhoff, and Dalgarno. The measured cross sections are comparable with the calculated values.

  8. Observation of Quiet Limb in He I 1083.0 nm, H Paschen alpha1281.8 nm and H Brackett gamma 2166.1 nm lines

    NASA Astrophysics Data System (ADS)

    Prasad Choudhary, Debi

    2016-05-01

    In this paper, we shall present the results of an observational study of the quiet solar limb in the near infrared lines using the New IR Array Camera (NAC) and the vertical spectrograph at the focal plane of McMath-Pierce telescope. The NAC, at the exit port of the spectrograph, was used to record the limb spectrum in HeI 1083.0 nm, Hydrogen Paschen 1281.8 nm and Brackett 2165.5 nm wavelength regions. The NAC is a 1024x1024 InSb Alladin III Detector operating over 1-5 micron range with high density sampling at 0.018 arc second/pixel. The all-reflective optical train minimizes number of surfaces and eliminates ghosts leading to low scatter, ghost-free optics. The close-cycle cryogenic provides a stable cooling environment over six hour period with an accuracy of 0.01K leading to low dark current. The low read out noise combined with low scattered light and dark current makes NAC an ideal detector for making high quality infrared spectral observations of solar limb. The limb spectrums were obtained by placing the spectrograph slit perpendicular to the limb at an interval of 10 degrees around the solar disk. We shall report the intensity profile, line-of-sight velocity and line width distribution around the sun derived from the spectra along the slit.

  9. Inorganic immersion fluids for ultrahigh numerical aperture 193 nm lithography

    NASA Astrophysics Data System (ADS)

    Zhou, Jianming; Fan, Yongfa; Bourov, Anatoly; Smith, Bruce W.

    2006-05-01

    Immersion lithography has become attractive since it can reduce critical dimensions by increasing numerical aperture (NA) beyond unity. Among all the candidates for immersion fluids, those with higher refractive indices and low absorbance are desired. Characterization of the refractive indices and absorbance of various inorganic fluid candidates has been performed. To measure the refractive indices of these fluids, a prism deviation angle method was developed. Several candidates have been identified for 193 nm application with refractive indices near 1.55, which is approximately 0.1 higher than that of water at this wavelength. Cauchy parameters of these fluids were generated and approaches were investigated to tailor the fluid absorption edges to be close to 193 nm. The effects of these fluids on photoresist performance were also examined with 193 nm immersion lithography exposure at various NAs. Half-pitch 32 nm lines were obtained with phosphoric acid as the immersion medium at 1.5 NA. These fluids are potential candidates for immersion lithography technology.

  10. Chromosomes without a 30-nm chromatin fiber

    PubMed Central

    Joti, Yasumasa; Hikima, Takaaki; Nishino, Yoshinori; Kamada, Fukumi; Hihara, Saera; Takata, Hideaki; Ishikawa, Tetsuya; Maeshima, Kazuhiro

    2012-01-01

    How is a long strand of genomic DNA packaged into a mitotic chromosome or nucleus? The nucleosome fiber (beads-on-a-string), in which DNA is wrapped around core histones, has long been assumed to be folded into a 30-nm chromatin fiber, and a further helically folded larger fiber. However, when frozen hydrated human mitotic cells were observed using cryoelectron microscopy, no higher-order structures that included 30-nm chromatin fibers were found. To investigate the bulk structure of mitotic chromosomes further, we performed small-angle X-ray scattering (SAXS), which can detect periodic structures in noncrystalline materials in solution. The results were striking: no structural feature larger than 11 nm was detected, even at a chromosome-diameter scale (~1 μm). We also found a similar scattering pattern in interphase nuclei of HeLa cells in the range up to ~275 nm. Our findings suggest a common structural feature in interphase and mitotic chromatins: compact and irregular folding of nucleosome fibers occurs without a 30-nm chromatin structure. PMID:22825571

  11. Radiation Failures in Intel 14nm Microprocessors

    NASA Technical Reports Server (NTRS)

    Bossev, Dobrin P.; Duncan, Adam R.; Gadlage, Matthew J.; Roach, Austin H.; Kay, Matthew J.; Szabo, Carl; Berger, Tammy J.; York, Darin A.; Williams, Aaron; LaBel, K.; Ingalls, James D.

    2016-01-01

    In this study the 14 nm Intel Broadwell 5th generation core series 5005U-i3 and 5200U-i5 was mounted on Dell Inspiron laptops, MSI Cubi and Gigabyte Brix barebones and tested with Windows 8 and CentOS7 at idle. Heavy-ion-induced hard- and catastrophic failures do not appear to be related to the Intel 14nm Tri-Gate FinFET process. They originate from a small (9 m 140 m) area on the 32nm planar PCH die (not the CPU) as initially speculated. The hard failures seem to be due to a SEE but the exact physical mechanism has yet to be identified. Some possibilities include latch-ups, charge ion trapping or implantation, ion channels, or a combination of those (in biased conditions). The mechanism of the catastrophic failures seems related to the presence of electric power (1.05V core voltage). The 1064 nm laser mimics ionization radiation and induces soft- and hard failures as a direct result of electron-hole pair production, not heat. The 14nm FinFET processes continue to look promising for space radiation environments.

  12. Diode laser (980nm) cartilage reshaping

    NASA Astrophysics Data System (ADS)

    El Kharbotly, A.; El Tayeb, T.; Mostafa, Y.; Hesham, I.

    2011-03-01

    Loss of facial or ear cartilage due to trauma or surgery is a major challenge to the otolaryngologists and plastic surgeons as the complicated geometric contours are difficult to be animated. Diode laser (980 nm) has been proven effective in reshaping and maintaining the new geometric shape achieved by laser. This study focused on determining the optimum laser parameters needed for cartilage reshaping with a controlled water cooling system. Harvested animal cartilages were angulated with different degrees and irradiated with different diode laser powers (980nm, 4x8mm spot size). The cartilage specimens were maintained in a deformation angle for two hours after irradiation then released for another two hours. They were serially measured and photographed. High-power Diode laser irradiation with water cooling is a cheep and effective method for reshaping the cartilage needed for reconstruction of difficult situations in otorhinolaryngologic surgery. Key words: cartilage,diode laser (980nm), reshaping.

  13. Ar-ion-laser-pumped infrared dye laser at 875-1084 nm

    SciTech Connect

    Kato, K.

    1984-12-01

    High-efficiency high-power cw dye-laser operation has been acheived from 875 to 1084 nm by pumping two styryl derivatives with an Ar-ion laser. Peak output powers as high as 900 and 750 mW were obtained around 925 and 980 nm, respectively.

  14. Study of the emission spectra of a 1320-nm semiconductor disk laser and its second harmonic

    NASA Astrophysics Data System (ADS)

    Gochelashvili, K. S.; Derzhavin, S. I.; Evdokimova, O. N.; Zolotovskii, I. O.; Podmazov, S. V.

    2016-03-01

    The spectral characteristics of an optically pumped external-cavity semiconductor disk laser near λ = 1320 nm are studied experimentally. Intracavity second harmonic generation is obtained using an LBO nonlinear crystal. The output power at a wavelength of 660 nm in the cw regime was 620 mW, and the peak power in the pulsed regime was 795 mW.

  15. Advances in 193 nm excimer lasers for mass spectrometry applications

    NASA Astrophysics Data System (ADS)

    Delmdahl, Ralph; Esser, Hans-Gerd; Bonati, Guido

    2016-03-01

    Ongoing progress in mass analysis applications such as laser ablation inductively coupled mass spectrometry of solid samples and ultraviolet photoionization mediated sequencing of peptides and proteins is to a large extent driven by ultrashort wavelength excimer lasers at 193 nm. This paper will introduce the latest improvements achieved in the development of compact high repetition rate excimer lasers and elaborate on the impact on mass spectrometry instrumentation. Various performance and lifetime measurements obtained in a long-term endurance test over the course of 18 months will be shown and discussed in view of the laser source requirements of different mass spectrometry tasks. These sampling type applications are served by excimer lasers delivering pulsed 193 nm output of several mJ as well as fast repetition rates which are already approaching one Kilohertz. In order to open up the pathway from the laboratory to broader market industrial use, sufficient component lifetimes and long-term stable performance behavior have to be ensured. The obtained long-term results which will be presented are based on diverse 193 nm excimer laser tube improvements aiming at e.g. optimizing the gas flow dynamics and have extended the operational life the laser tube for the first time over several billion pulses even under high duty-cycle conditions.

  16. Super ACO FEL oscillation at 300 nm

    NASA Astrophysics Data System (ADS)

    Nutarelli, D.; Garzella, D.; Renault, E.; Nahon, L.; Couprie, M. E.

    2000-05-01

    Some recent improvements, involving both the optical cavity mirrors and the positron beam dynamics in the storage ring, have allowed us to achieve a laser oscillation at 300 nm on the Super ACO Storage Ring FEL. The Super ACO storage ring is operated at 800 MeV which is the nominal energy for the usual synchrotron radiation users, and the highest energy for a storage ring FEL. The lasing at 300 nm could be kept during 2 h per injection, with a stored current ranging between 30 and 60 mA. The FEL characteristics are presented here. The longitudinal stability and the FEL optics behaviour are also discussed.

  17. 1550-nm wavelength-tunable HCG VCSELs

    NASA Astrophysics Data System (ADS)

    Chase, Christopher; Rao, Yi; Huang, Michael; Chang-Hasnain, Connie

    2014-02-01

    We demonstrate wavelength-tunable VCSELs using high contrast gratings (HCGs) as the top output mirror on VCSELs, operating at 1550 nm. Tunable HCG VCSELs with a ~25 nm mechanical tuning range as well as VCSELs with 2 mW output power were realized. Error-free operation of an optical link using directly-modulated tunable HCG VCSELs transmitting at 1.25 Gbps over 18 channels spaced by 100 GHz and transmitted over 20 km of single mode fiber is demonstrated, showing the suitability of the HCG tunable VCSEL as a low cost source for WDM communications systems.

  18. 21-nm-range wavelength-tunable L-band Er-doped fiber linear-cavity laser

    NASA Astrophysics Data System (ADS)

    Yang, Shiquan; Zhao, Chunliu; Li, Zhaohui; Ding, Lei; Yuan, Shuzhong; Dong, Xiaoyi

    2001-10-01

    A novel method, which utilizes amplified spontaneous emission (ASE) as a secondary pump source, is presented for implanting a linear cavity erbium-doped fiber laser operating in L-Band. The output wavelength tuned from 1566 nm to 1587 nm, about 21 nm tuning range, was obtained in the experiment and the stability of the laser is very good.

  19. Laser-induced damage measurements with 266-nm pulses

    NASA Astrophysics Data System (ADS)

    Deaton, T. F.; Smith, W. L.

    1980-07-01

    Results of a survey of laser-induced damage thresholds for optical components at 266-nm are reported. The thresholds were measured at two pulse durations; 0.150 ns and 1.0 ns. The 30 samples tested include four commercial dielectric reflectors, three metallic reflectors, two anti-reflection films, a series of eight half-wave oxide and fluoride films, and twelve bare surfaces (fluoride crystals, silica, sapphire, BK-7 glass, cesium dideuterium arsenate and potassium dihydrogen phosphate). The 266-nm pulses were obtained by frequency-quadrupling a Nd:YAG, glass laser. Equivalent plane imagery and calorimetry were used to measure the peak fluence of each of the UV pulses with an accuracy of + or - of 15%; the uncertainty in the threshold determinations is typically + or - 30%.

  20. A compact efficient deep ultraviolet laser at 266 nm

    NASA Astrophysics Data System (ADS)

    Zhai, S. Y.; Wang, X. L.; Wei, Y.; Chen, W. D.; Zhuang, F. J.; Xu, S.; Li, B. X.; Fu, J. J.; Chen, Z. Q.; Wang, H. W.; Huang, C. H.; Zhang, G.

    2013-04-01

    We present a highly efficient and cost-effective watt-level deep-ultraviolet laser operating at 266 nm. Type-I phase-matching LBO crystals and type-I phase-matching BBO crystals were used for frequency doubling and fourth-harmonic generation, respectively. The highest 1.82 W average power of the 266 nm laser was obtained from nonlinear frequency conversion at a repetition rate of 30 kHz and a pump power of 18.8 W. The conversion efficiency from the diode to the deep-ultraviolet laser scales up to 10.7%. This is, to our knowledge, the highest efficiency ever reported generated from a laser diode single-end-pumped acousto-optic Q-switched system.

  1. Optical responses of a metal with sub-nm gaps.

    PubMed

    Park, Sang Jun; Kim, Tae Yun; Park, Cheol-Hwan; Kim, Dai-Sik

    2016-01-01

    If the size of a metallic structure is reduced to be comparable to or even smaller than the typical quantum-mechanical lengths such as the Fermi wavelength or Thomas-Fermi wavelength, the electronic structure and optical responses are modulated by quantum effects. Here, we calculate the optical responses of a metal with sub-nm gaps using the eigenstates obtained from an effective-mass quantum theory. According to our simulation, the dielectric responses can be significantly modified by tuning the inter-gap distances. Remarkably, sub-nm gaps occupying a 0.3% volumetric fraction can elongate the penetration depth by an order of magnitude in the terahertz regime. We find that the detailed dependences of electron-photon interaction matrix elements on the involved electronic wavefunctions play an important role in the optical responses. The results draw our attention to these recently fabricated systems. PMID:26964884

  2. An evaluation of 685 nm fluorescence imagery of coastal waters

    NASA Technical Reports Server (NTRS)

    Kim, H. H.; Van Der Piepen, H.; Amann, V.; Doerffer, R.

    1985-01-01

    To evaluate the possible application of sunlight-illuminated fluorescence at 685 nm for remote sensing of phytoplankton concentrations, an ocean-color scanner is flown on an aircraft. The results of an analysis of the scanner data, obtained from a series of test flights conducted along the Elbe River and its estuary in the North Sea, show that 685 nm fluorescence is a promising remote-sensing method. The observation of a strong correlation between the fluorescence yields and the chlorophyll concentrations determined by the absorption method which uses the reflectance ratio of blue/green channels, is discussed. The two methods are compared and it is shown that the fluorescence method has an edge over the other due to the data-processing algorithm and its applicability for surveying bio-resources in all types of water. Photographs of the chlorophyll patterns are presented.

  3. Optical responses of a metal with sub-nm gaps

    PubMed Central

    Park, Sang Jun; Kim, Tae Yun; Park, Cheol-Hwan; Kim, Dai-Sik

    2016-01-01

    If the size of a metallic structure is reduced to be comparable to or even smaller than the typical quantum-mechanical lengths such as the Fermi wavelength or Thomas-Fermi wavelength, the electronic structure and optical responses are modulated by quantum effects. Here, we calculate the optical responses of a metal with sub-nm gaps using the eigenstates obtained from an effective-mass quantum theory. According to our simulation, the dielectric responses can be significantly modified by tuning the inter-gap distances. Remarkably, sub-nm gaps occupying a 0.3% volumetric fraction can elongate the penetration depth by an order of magnitude in the terahertz regime. We find that the detailed dependences of electron-photon interaction matrix elements on the involved electronic wavefunctions play an important role in the optical responses. The results draw our attention to these recently fabricated systems. PMID:26964884

  4. Ultraviolet (250-550  nm) absorption spectrum of pure water.

    PubMed

    Mason, John D; Cone, Michael T; Fry, Edward S

    2016-09-01

    Data for the spectral light absorption of pure water from 250 to 550 nm have been obtained using an integrating cavity made from a newly developed diffuse reflector with a very high UV reflectivity. The data provide the first scattering-independent measurements of absorption coefficients in the spectral gap between well-established literature values for the absorption coefficients in the visible (>400  nm) and UV (<200  nm). A minimum in the absorption coefficient has been observed in the UV at 344 nm; the value is 0.000811±0.000227  m-1. PMID:27607297

  5. Upconverted luminescence under 800 nm laser diode excitation in Nd 3+-activated fluoroaluminate glass

    NASA Astrophysics Data System (ADS)

    Koepke, Cz.; Wisniewski, K.; Sikorski, L.; Piatkowski, D.; Kowalska, K.; Naftaly, M.

    2006-01-01

    We report on the upconverted luminescence in neodymium-activated fluoroaluminate glass obtained with 800 nm diode laser excitation. Several anti-Stokes emissions: at 588, 607, 720 and 750 nm are observed and appropriate transitions are assigned. For both latter emissions we observe strong dependence on temperature: the 720 nm emission intensity decreases with temperature, whereas the 750 nm emission increases. Interpretations are presented in terms of the influence of oxygen-affected sites on the radiationless transitions and multiphonon anti-Stokes excitation. The models provide reasonable fits to the experimental data.

  6. Radiation Tolerance of 65nm CMOS Transistors

    DOE PAGESBeta

    Krohn, M.; Bentele, B.; Christian, D. C.; Cumalat, J. P.; Deptuch, G.; Fahim, F.; Hoff, J.; Shenai, A.; Wagner, S. R.

    2015-12-11

    We report on the effects of ionizing radiation on 65 nm CMOS transistors held at approximately -20°C during irradiation. The pattern of damage observed after a total dose of 1 Grad is similar to damage reported in room temperature exposures, but we observe less damage than was observed at room temperature.

  7. Negative-tone 193-nm resists

    NASA Astrophysics Data System (ADS)

    Cho, Sungseo; Vander Heyden, Anthony; Byers, Jeff D.; Willson, C. Grant

    2000-06-01

    A great deal of progress has been made in the design of single layer positive tone resists for 193 nm lithography. Commercial samples of such materials are now available from many vendors. The patterning of certain levels of devices profits from the use of negative tone resists. There have been several reports of work directed toward the design of negative tones resists for 193 nm exposure but, none have performed as well as the positive tone systems. Polymers with alicyclic structures in the backbone have emerged as excellent platforms from which to design positive tone resists for 193 nm exposure. We now report the adaptation of this class of polymers to the design of high performance negative tone 193 nm resists. New systems have been prepared that are based on a polarity switch mechanism for modulation of the dissolution rate. The systems are based on a polar, alicyclic polymer backbone that includes a monomer bearing a glycol pendant group that undergoes the acid catalyzed pinacol rearrangement upon exposure and bake to produce the corresponding less polar ketone. This monomer was copolymerized with maleic anhydride and a norbornene bearing a bis-trifluoromethylcarbinol. The rearrangement of the copolymer was monitored by FT-IR as a function of temperature. The synthesis of the norbornene monomers will be presented together with characterization of copolymers of these monomers with maleic anhydride. The lithographic performance of the new resist system will also be presented.

  8. White Sands, Carrizozo Lava Beds, NM

    NASA Technical Reports Server (NTRS)

    1973-01-01

    A truly remarkable view of White Sands and the nearby Carrizozo Lava Beds in southeast NM (33.5N, 106.5W). White Sands, site of the WW II atomic bomb development and testing facility and later post war nuclear weapons testing that can still be seen in the cleared circular patterns on the ground.

  9. Aqueous glucose measurement using differential absorption-based frequency domain optical coherence tomography at wavelengths of 1310 nm and 1625 nm

    NASA Astrophysics Data System (ADS)

    John, Pauline; Manoj, Murali; Sujatha, N.; Vasa, Nilesh J.; Rao, Suresh R.

    2015-07-01

    This work presents a combination of differential absorption technique and frequency domain optical coherence tomography for detection of glucose, which is an important analyte in medical diagnosis of diabetes. Differential absorption technique is used to detect glucose selectively in the presence of interfering species especially water and frequency domain optical coherence tomography (FDOCT) helps to obtain faster acquisition of depth information. Two broadband super-luminescent diode (SLED) sources with centre wavelengths 1586 nm (wavelength range of 1540 to 1640 nm) and 1312 nm (wavelength range of 1240 to 1380 nm) and a spectral width of ≍ 60 nm (FWHM) are used. Preliminary studies on absorption spectroscopy using various concentrations of aqueous glucose solution gave promising results to distinguish the absorption characteristics of glucose at two wavelengths 1310 nm (outside the absorption band of glucose) and 1625 nm (within the absorption band of glucose). In order to mimic the optical properties of biological skin tissue, 2% and 10% of 20% intralipid with various concentrations of glucose (0 to 4000 mg/dL) was prepared and used as sample. Using OCT technique, interference spectra were obtained using an optical spectrum analyzer with a resolution of 0.5 nm. Further processing of the interference spectra provided information on reflections from the surfaces of the cuvette containing the aqueous glucose sample. Due to the absorption of glucose in the wavelength range of 1540 nm to 1640 nm, a trend of reduction in the intensity of the back reflected light was observed with increase in the concentration of glucose.

  10. 37 W 888-nm-pumped grown-together composite crystal YVO4/Nd:YVO4/YVO4 oscillator at 1342 nm

    NASA Astrophysics Data System (ADS)

    Zhang, X.-F.; Li, F.-Q.; Zong, N.; Le, X.-Y.; Cui, D.-F.; Xu, Z.-Y.

    2011-07-01

    We report on a continuous-wave Nd:YVO4 oscillator at 1342 nm based on the combination of a grown-together composite crystal YVO4/Nd:YVO4/YVO4 and the 888 nm diode-laser direct pumping for the first time. At the absorbed pump power of 102 W, a maximum average output power of 37.2 W at 1342 nm was obtained, corresponding to an optical-optical conversion efficiency of 36.5% and a high slope efficiency of 63.0%, respectively. To the best of our knowledge, this is the highest output power ever obtained for a 1342 nm Nd:YVO4 oscillator.

  11. Pupillary responses of chromatic stimulus in the visible spectrum 400 nm of 650 nm, in the stable state

    NASA Astrophysics Data System (ADS)

    Guzman, D. R.; Lopez, A. Z.; Gomez, E. S.

    2005-08-01

    an instrumental methodology was implemented to analyze the pupillary responses in the dilation and contraction process elicited by chromatic stimulus. Chromatic stimuli were employed in the visible spectrum from 400 nm to 650 nm. Three different stimulation software was developed and used in order to obtain a contrasted pupillary response PG0, PG12 and PG20. This test was applied to 39 subjects (29 male, 9 female and I child, 22-52 years and 6 years), 10 of them were stimulated with PG0, 21 were stimulated with PG12 and 16 with PG20. 6 subjects participate at least in 2 tests. Ishihara plates were exhibited to the Subjects before the stimulation, 37 of the present a normal vision color, I present deuteranopy.

  12. VizieR Online Data Catalog: Thorium spectrum from 250nm to 5500nm (Redman+, 2014)

    NASA Astrophysics Data System (ADS)

    Redman, S. L.; Nave, G.; Sansonetti, C. J.

    2014-04-01

    We observed the spectrum of a commercial sealed Th/Ar HCL running at 25mA for almost 15hr starting on 2011 November 2. The region of observation was limited to between 8500/cm and 28000/cm (360nm and 1200nm) by the sensitivity of the silicon photodiode detector. (5 data files).

  13. All solid-state continuous-wave Nd:YAG laser at 1319 and 659.5 nm under direct 885 nm pumping

    NASA Astrophysics Data System (ADS)

    Lü, Y. F.; Zhang, X. H.; Xia, J.; Yin, X. D.; Bao, L.; Quan, H.

    2010-01-01

    The continuous-wave high efficiency laser emission of Nd:YAG at the fundamental wavelength of 1319 nm and its 659.5-nm second harmonic obtained by intracavity frequency doubling with an LBO nonlinear crystal is investigated under pumping by diode laser at 885 nm (on the 4 F 3/2 → 4 I 13/2 transition). An end-pumped Nd:YAG crystal yielded 9.1 W at 1319 nm of continuous-wave output power for 18.2 W of absorbed pump power. The slope efficiency with respect to the absorbed pump power is 0.55. Furthermore, 5.2 W 659.5 nm red light is acquired by frequency doubling, resulting in an optical-to-optical efficiency with respect to the absorbed pump power of 0.286. Comparative results obtained for the pump with diode laser at 808 nm (on the 4 F 5/2 → 4 I 13/2 transition) are given in order to prove the advantages of the 885 nm wavelength pumping.

  14. Diode-pumped Nd:YVO4-Nd:YLF blue laser at 488 nm by intracavity sum-frequency-mixing

    NASA Astrophysics Data System (ADS)

    Lü, Y. F.; Xia, J.; Zhang, X. H.; Li, C. L.; Zhao, Z. M.; Liu, Z. T.

    2010-07-01

    We report a laser architecture to obtain continuous-wave blue radiation at 488 nm. A 808 nm diodepumped the Nd:YVO4 crystal emitting at 914 nm. A part of the pump power was then absorbed by the Nd:YVO4 crystal. The remaining was used to pump the Nd:YLF crystal emitting at 1047 nm. Intracavity sum-frequency mixing at 914 and 1047 nm was then realized in a LBO crystal to reach the blue radiation. We obtained a continuous-wave output power of 514 mW at 488 nm with a pump laser diode emitting 19.6 W at 808 nm.

  15. Boron-nitrogen substituted perylene obtained through photocyclisation.

    PubMed

    Müller, Matthias; Behnle, Stefan; Maichle-Mössmer, Cäcilia; Bettinger, Holger F

    2014-07-25

    A BN substituted hexabenzotriphenylene (B3N3) closes one C-C-bond upon irradiation with light of 280-400 nm in the presence of iodine to yield a phenanthrene annelated B3N3 tribenzoperylene. Upon hydrolysis a B2N2 dibenzoperylene is obtained. PMID:24905718

  16. Laser damage database at 1064 nm

    SciTech Connect

    Rainer, F.; Gonzales, R.P.; Morgan, A.J.

    1990-03-01

    In conjunction with our diversification of laser damage testing capabilities, we have expanded upon a database of threshold measurements and parameter variations at 1064 nm. This includes all tests at low pulse-repetition frequencies (PRF) ranging from single shots to 120 Hz. These tests were conducted on the Reptile laser facility since 1987 and the Variable Pulse Laser (VPL) facility since 1988. Pulse durations ranged from 1 to 16 ns. 10 refs., 14 figs.

  17. Sunlight induced 685 nm fluorescence imagery

    NASA Technical Reports Server (NTRS)

    Kim, Hongsuk H.; Van Der Piepen, Heinz

    1986-01-01

    The capability of a new fluorescence method is evaluated using data from an aircraft fluorescence experiment conducted on the Elbe River on August 10-14, 1981. The technique measures chlorophyll concentrations by monitoring sunlight-induced fluorescence at 685 nm. Upwelling radiance spectra and vertical profiles of upwelling radiances are presented and analyzed. The image-processing algorithm used to retrieve fluorescence signals from raw data is described.

  18. Radiation Status of Sub-65 nm Electronics

    NASA Technical Reports Server (NTRS)

    Pellish, Jonathan A.

    2011-01-01

    Ultra-scaled complementary metal oxide semiconductor (CMOS) includes commercial foundry capabilities at and below the 65 nm technology node Radiation evaluations take place using standard products and test characterization vehicles (memories, logic/latch chains, etc.) NEPP focus is two-fold: (1) Conduct early radiation evaluations to ascertain viability for future NASA missions (i.e. leverage commercial technology development). (2) Uncover gaps in current testing methodologies and mechanism comprehension -- early risk mitigation.

  19. Binary 193nm photomasks aging phenomenon study

    NASA Astrophysics Data System (ADS)

    Dufaye, Félix; Sartelli, Luca; Pogliani, Carlo; Gough, Stuart; Sundermann, Frank; Miyashita, Hiroyuki; Hidenori, Yoshioka; Charras, Nathalie; Brochard, Christophe; Thivolle, Nicolas

    2011-05-01

    193nm binary photomasks are still used in the semiconductor industry for the lithography of some critical layers for the nodes 90nm and 65nm, with high volumes and over long period. These 193nm binary masks seem to be well-known but recent studies have shown surprising degrading effects, like Electric Field induced chromium Migration (EFM) [1] or chromium migration [2] [3] . Phase shift Masks (PSM) or Opaque MoSi On Glass (OMOG) might not be concerned by these effects [4] [6] under certain conditions. In this paper, we will focus our study on two layers gate and metal lines. We will detail the effects of mask aging, with SEM top view pictures revealing a degraded chromium edge profile and TEM chemical analyses demonstrating the growth of a chromium oxide on the sidewall. SEMCD measurements after volume production indicated a modified CD with respect to initial CD data after manufacture. A regression analysis of these CD measurements shows a radial effect, a die effect and an isolated-dense effect. Mask cleaning effectiveness has also been investigated, with sulphate or ozone cleans, to recover the mask quality in terms of CD. In complement, wafer intrafield CD measurements have been performed on the most sensitive structure to monitor the evolution of the aging effect on mask CD uniformity. Mask CD drift have been correlated with exposure dose drift and isolated-dense bias CD drift on wafers. In the end, we will try to propose a physical explanation of this aging phenomenon and a solution to prevent from it occurring.

  20. Development of high coherence high power 193nm laser

    NASA Astrophysics Data System (ADS)

    Tanaka, Satoshi; Arakawa, Masaki; Fuchimukai, Atsushi; Sasaki, Yoichi; Onose, Takashi; Kamba, Yasuhiro; Igarashi, Hironori; Qu, Chen; Tamiya, Mitsuru; Oizumi, Hiroaki; Ito, Shinji; Kakizaki, Koji; Xuan, Hongwen; Zhao, Zhigang; Kobayashi, Yohei; Mizoguchi, Hakaru

    2016-03-01

    We have been developing a hybrid 193 nm ArF laser system that consists of a solid state seeding laser and an ArF excimer laser amplifier for power-boosting. The solid state laser consists of an Yb-fiber-solid hybrid laser system and an Er-fiber laser system as fundamentals, and one LBO and three CLBO crystals for frequency conversion. In an ArF power amplifier, the seed laser passes through the ArF gain media three times, and an average power of 110 W is obtained. As a demonstration of the potential applications of the laser, an interference exposure test is performed.

  1. Operational Experiences Tuning the ATF2 Final Focus Optics Towards Obtaining a 37nm Electron Beam IP Spot Size

    SciTech Connect

    White, Glen; Seryi, Andrei; Woodley, Mark; Bai, Sha; Bambade, Philip; Renier, Yves; Bolzon, Benoit; Kamiya, Yoshio; Komamiya, Sachio; Oroku, Masahiro; Yamaguchi, Yohei; Yamanaka, Takashi; Kubo, Kiyoshi; Kuroda, Shigeru; Okugi, Toshiyuki; Tauchi, Toshiaki; Marin, Eduardo; /CERN

    2012-07-06

    The primary aim of the ATF2 research accelerator is to test a scaled version of the final focus optics planned for use in next-generation linear lepton colliders. ATF2 consists of a 1.3 GeV linac, damping ring providing low-emittance electron beams (< 12pm in the vertical plane), extraction line and final focus optics. The design details of the final focus optics and implementation at ATF2 are presented elsewhere. The ATF2 accelerator is currently being commissioned, with a staged approach to achieving the design IP spot size. It is expected that as we implement more demanding optics and reduce the vertical beta function at the IP, the tuning becomes more difficult and takes longer. We present here a description of the implementation of the tuning procedures and describe operational experiences and performances.

  2. AIMS mask qualification for 32nm node

    NASA Astrophysics Data System (ADS)

    Richter, Rigo; Thaler, Thomas; Seitz, Holger; Stroessner, Ulrich; Scheruebl, Thomas

    2009-10-01

    Moving forward to 32nm node and below optical lithography using 193nm is faced with complex requirements to be solved. Mask makers are forced to address both Double Patterning Techniques and Computational Lithography approaches such as Source Mask Optimizations and Inverse Lithography. Additionally, lithography at low k1 values increases the challenges for mask repair as well as for repair verification and review by AIMSTM. Higher CD repeatability, more flexibility in the illumination settings as well as significantly improved image performance must be added when developing the next generation mask qualification equipment. This paper reports latest measurement results verifying the appropriateness of the latest member of AIMSTM measurement tools - the AIMSTM 32-193i. We analyze CD repeatability measurements on lines and spaces pattern. The influence of the improved optical performance and newly introduced interferometer stage will be verified. This paper highlights both the new Double Patterning functionality emulating double patterning processes and the influence of its critical parameters such as overlay errors and resist impact. Beneficial advanced illumination schemes emulating scanner illumination document the AIMSTM 32-193i to meet mask maker community's requirements for the 32nm node.

  3. Employment Obtaining and Business Starting

    ERIC Educational Resources Information Center

    Lan, Jian

    2009-01-01

    The implementation of business starting education in higher vocational colleges is of important and realistic meanings for cultivating advanced technology application-type talents and for releasing the employment obtaining pressure of higher vocational students. Based on the analysis on the employment situation of higher vocational graduates, this…

  4. Obtaining Public Records: Reporter Guide

    ERIC Educational Resources Information Center

    Hammond, Betsy

    2013-01-01

    Obtaining public records is essential to covering public education. Fortunately, the law is on the side of reporters: Public agencies generally must disclose their records to the public and to the media--with important exceptions. Public agencies are often reluctant to hand over records, however, even when the law clearly says they should.…

  5. Photoelectron Emission Studies in CsBr at 257 nm

    SciTech Connect

    Maldonado, Juan R.; Liu, Zhi; Sun, Yun; Pianetta, Piero A.; Pease, Fabian W.; /Stanford U., Elect. Eng. Dept. /SLAC, SSRL

    2006-09-28

    CsBr/Cr photocathodes were found [1,2] to meet the requirements of a multi-electron beam lithography system operating with a light energy of 4.8 eV (257nm). The fact that photoemission was observed with a light energy below the reported 7.3 eV band gap for CsBr was not understood. This paper presents experimental results on the presence of intra-band gap absorption sites (IBAS) in CsBr thin film photo electron emitters, and presents a model based on IBAS to explain the observed photoelectron emission behavior at energies below band gap. A fluorescence band centered at 330 nm with a FWHM of about 0.34 eV was observed in CsBr/Cr samples under 257 nm laser illumination which can be attributed to IBAS and agrees well with previously obtained synchrotron photoelectron spectra[1] from the valence band of CsBr films.

  6. Efficient laser action on the 342-nm band of molecular iodine using ArF laser pumping

    NASA Astrophysics Data System (ADS)

    Shaw, M. J.; Edwards, C. B.; Oneill, F.; Fotakis, C.; Donovan, R. J.

    1980-08-01

    Strong laser action on the 342-nm band of I2 has been obtained by transverse pumping I2/SF6 mixtures at 193 nm with an ArF laser. The highest output energy obtained was 230 mJ at an intrinsic energy conversion efficiency of approximately 30% equivalent to a photon efficiency of greater than 50%.

  7. Truncated States Obtained by Iteration

    NASA Astrophysics Data System (ADS)

    Cardoso B., W.; Almeida G. de, N.

    2008-02-01

    We introduce the concept of truncated states obtained via iterative processes (TSI) and study its statistical features, making an analogy with dynamical systems theory (DST). As a specific example, we have studied TSI for the doubling and the logistic functions, which are standard functions in studying chaos. TSI for both the doubling and logistic functions exhibit certain similar patterns when their statistical features are compared from the point of view of DST.

  8. Intra-cavity upconversion to 631 nm of images illuminated by an eye-safe ASE source at 1550 nm.

    PubMed

    Torregrosa, A J; Maestre, H; Capmany, J

    2015-11-15

    We report an image wavelength upconversion system. The system mixes an incoming image at around 1550 nm (eye-safe region) illuminated by an amplified spontaneous emission (ASE) fiber source with a Gaussian beam at 1064 nm generated in a continuous-wave diode-pumped Nd(3+):GdVO(4) laser. Mixing takes place in a periodically poled lithium niobate (PPLN) crystal placed intra-cavity. The upconverted image obtained by sum-frequency mixing falls around the 631 nm red spectral region, well within the spectral response of standard silicon focal plane array bi-dimensional sensors, commonly used in charge-coupled device (CCD) or complementary metal-oxide-semiconductor (CMOS) video cameras, and of most image intensifiers. The use of ASE illumination benefits from a noticeable increase in the field of view (FOV) that can be upconverted with regard to using coherent laser illumination. The upconverted power allows us to capture real-time video in a standard nonintensified CCD camera. PMID:26565863

  9. Scaling of laser-induced contamination growth at 266nm and 355nm

    NASA Astrophysics Data System (ADS)

    Ließmann, M.; Jensen, L.; Balasa, I.; Hunnekuhl, M.; Büttner, A.; Weßels, P.; Neumann, J.; Ristau, D.

    2015-11-01

    The growth of laser-induced contamination (LIC) on optical components in extraterrestrial missions is a known issue especially for the UV spectral region. The Laser Zentrum Hannover e.V. is responsible for the development of a pulsed laser-system operating at a wavelength of 266 nm for the ExoMars mission and for the qualification of used optics and materials regarding LIC. In this context, toluene was utilized which is an often used model contaminant in LIC studies. Test cycles based on the application of the two UV wavelengths 355 nm and 266 nm on fused silica substrates and ARcoated optics are conducted and the observed contamination effects are compared. This scaling allows for a rough estimate of the destructive influence of LIC on space optics degradation at 266 nm. Further tests will be performed with materials integrated into the ExoMars-laser-head under near-operation environmental conditions.

  10. High-efficiency direct-pumped Nd:YVO 4-LBO laser operating at 671 nm

    NASA Astrophysics Data System (ADS)

    Lü, Yan-Fei; Zhang, Xi-He; Xia, Jing; Yin, Xiao-Dong; Zhang, An-Feng; Bao, Lin; Lü, Wang

    2010-04-01

    The continuous-wave high-efficiency laser emission from Nd:YVO 4 at the fundamental wavelength of 1342 nm and its 671 nm second harmonic obtained by intra-cavity frequency doubling in an LBO nonlinear crystal are investigated under pumping by diode laser at 880 nm (on the 4F 3/2→ 4I 13/2 transition). The end-pumped Nd:YVO 4 crystal yielded a continuous-wave output power of 9.6 W at 1342 nm for 18.9 W of absorbed pump power. The slope efficiency measured with respect to the absorbed pump power is 60%. An output of 5.5 W at 671 nm was obtained by frequency doubling, resulting in an optical-to-optical efficiency with respect to the absorbed pump power of 29%. Comparative results obtained for the pump with a diode laser at 808 nm (on the 4F 5/2→ 4I 13/2 transition) are given in order to prove the advantages of the 880 nm wavelength pumping.

  11. Deep ultraviolet (254 nm) focal plane array

    NASA Astrophysics Data System (ADS)

    Cicek, Erdem; Vashaei, Zahra; McClintock, Ryan; Razeghi, Manijeh

    2011-10-01

    We report the synthesis, fabrication and testing of a 320 × 256 focal plane array (FPA) of back-illuminated, solarblind, p-i-n, AlxGa1-xN-based detectors, fully realized within our research laboratory. We implemented a novel pulsed atomic layer deposition technique for the metalorganic chemical vapor deposition (MOCVD) growth of crackfree, thick, and high Al composition AlxGa1-xN layers. Following the growth, the wafer was processed into a 320 × 256 array of 25 μm × 25 μm pixels on a 30 μm pixel-pitch and surrounding mini-arrays. A diagnostic mini-array was hybridized to a silicon fan-out chip to allow the study of electrical and optical characteristics of discrete pixels of the FPA. At a reverse bias of 1 V, an average photodetector exhibited a low dark current density of 1.12×10-8 A/cm2. Solar-blind operation is observed throughout the array with peak detection occurring at wavelengths of 256 nm and lower and falling off three orders of magnitude by 285 nm. After indium bump deposition and dicing, the FPA is hybridized to a matching ISC 9809 readout integrated circuit (ROIC). By developing a novel masking technology, we significantly reduced the visible response of the ROIC and thus the need for external filtering to achieve solar- and visible-blind operation is eliminated. This allowed the FPA to achieve high external quantum efficiency (EQE): at 254 nm, average pixels showed unbiased peak responsivity of 75 mA/W, which corresponds to an EQE of ~37%. Finally, the uniformity of the FPA and imaging properties are investigated.

  12. Fluorinated dissolution inhibitors for 157-nm lithography

    NASA Astrophysics Data System (ADS)

    Hamad, Alyssandrea H.; Bae, Young C.; Liu, Xiang-Qian; Ober, Christopher K.; Houlihan, Francis M.; Dabbagh, Gary; Novembre, Anthony E.

    2002-07-01

    Fluorinated dissolution inhibitors (DIs) for 157 nm lithography were designed and synthesized as part of an ongoing study on the structure/property relationships of photoresist additives. The problem of volatilization of small DI candidates was observed from matrices such as poly(methyl methacrylate) (PMMA) and poly(hexafluorohydroxy-isopropyl styrene) (PHFHIPS) during post-apply bake cycles using Fourier Transform Infrared Spectroscopy (FT-IR). To avoid this problem, low volatility fluorinated inhibitors were designed and synthesized. Three fluorinated DIs, perfluorosuberic acid bis-(2,2,2,-trifluoro-1-phenyl-1-trifluoromethyl-ethyl) ester (PFSE1), perfluorosuberic acid bis-[1-(4-trifluoromethyl-phenyl)-ethyl] ester (PFSE2) and a fluorinated phenylmethanediol diester (FPMD1), largely remained in a PHFHIPS film during the post-apply bake. The dissolution behavior of the two fluorinated diesters was studied and found to slow down the dissolution rate of PHFHIPS with inhibition factors of 1.9 and 1.6, respectively. The absorbance of PHFHIPS films containing 10 wt% of the diester inhibitors is 3.6 AU/micron compared with an absorbance of 3.3 AU/micron for the polymer itself. The absorbance of 10% FPMD1 in PHFHIPS was measured as 3.5 AU/micron compared with an absorbance of 3.4 AU/micron for the polymer itself. Thus, the non-volatility and transparency of the fluorinated inhibitors at 157 nm as well as their ability to reduce the development rate of fluorinated polymers make them suitable for use in a 157 nm resist system.

  13. Results of the VISA SASE FEL Experiment at 840 nm

    SciTech Connect

    Murokh, A.

    2004-01-20

    VISA (Visible to Infrared SASE Amplifier) is a high-gain self-amplified spontaneous emission FEL, which achieved saturation at 840 nm within a single-pass 4-m undulator. A gain length shorter than 18 cm has been obtained, yielding the gain of 2 x 10{sup 8} at saturation. The FEL performance, including spectral, angular, and statistical properties of SASE radiation, has been characterized for different electron beam conditions. The results are compared to 3-D SASE FEL theory and start-to-end numerical simulations of the entire injector, transport, and FEL system. Detailed agreement between simulations and experimental results is obtained over the wide range of the electron beam parameters.

  14. Results of the VISA SASE FEL experiment at 840 nm

    NASA Astrophysics Data System (ADS)

    Murokh, A.; Agustsson, R.; Babzien, M.; Ben-Zvi, I.; Bertolini, L.; van Bibber, K.; Carr, R.; Cornacchia, M.; Frigola, P.; Hill, J.; Johnson, E.; Klaisner, L.; Le Sage, G.; Libkind, M.; Malone, R.; Nuhn, H.-D.; Pellegrini, C.; Reiche, S.; Rakowsky, G.; Rosenzweig, J.; Ruland, R.; Skaritka, J.; Toor, A.; Tremaine, A.; Wang, X.; Yakimenko, V.

    2003-07-01

    VISA (Visible to Infrared SASE Amplifier) is a high-gain self-amplified spontaneous emission FEL, which achieved saturation at 840 nm within a single-pass 4-m undulator. A gain length shorter than 18 cm has been obtained, yielding the gain of 2×10 8 at saturation. The FEL performance, including spectral, angular, and statistical properties of SASE radiation, has been characterized for different electron beam conditions. The results are compared to 3-D SASE FEL theory and start-to-end numerical simulations of the entire injector, transport, and FEL system. Detailed agreement between simulations and experimental results is obtained over the wide range of the electron beam parameters.

  15. Quantitative comparison of the OCT imaging depth at 1300 nm and 1600 nm

    PubMed Central

    Kodach, V. M.; Kalkman, J.; Faber, D. J.; van Leeuwen, T. G.

    2010-01-01

    One of the present challenges in optical coherence tomography (OCT) is the visualization of deeper structural morphology in biological tissues. Owing to a reduced scattering, a larger imaging depth can be achieved by using longer wavelengths. In this work, we analyze the OCT imaging depth at wavelengths around 1300 nm and 1600 nm by comparing the scattering coefficient and OCT imaging depth for a range of Intralipid concentrations at constant water content. We observe an enhanced OCT imaging depth for 1600 nm compared to 1300 nm for Intralipid concentrations larger than 4 vol.%. For higher Intralipid concentrations, the imaging depth enhancement reaches 30%. The ratio of scattering coefficients at the two wavelengths is constant over a large range of scattering coefficients and corresponds to a scattering power of 2.8 ± 0.1. Based on our results we expect for biological tissues an increase of the OCT imaging depth at 1600 nm compared to 1300 nm for samples with high scattering power and low water content. PMID:21258456

  16. Photolysis of formic acid at 355 nm

    NASA Astrophysics Data System (ADS)

    Martinez, Denhi; Bautista, Teonanacatl; Guerrero, Alfonso; Alvarez, Ignacio; Cisneros, Carmen

    2015-05-01

    Formic acid is well known as a food additive and recently an application on fuel cell technology has emerged. In this work we have studied the dissociative ionization process by multiphoton absorption of formic acid molecules at 355nm wavelength photons, using TOF spectrometry in reflectron mode (R-TOF). Some of the most abundant ionic fragments produced are studied at different settings of the laser harmonic generator. The dependence of the products on these conditions is reported. This work was supported by CONACYT Project 165410 and PAPIIT IN102613 and IN101215.

  17. 248nm silicon photoablation: Microstructuring basics

    NASA Astrophysics Data System (ADS)

    Poopalan, P.; Najamudin, S. H.; Wahab, Y.; Mazalan, M.

    2015-05-01

    248nm pulses from a KrF excimer laser was used to ablate a Si wafer in order to ascertain the laser pulse and energy effects for use as a microstructuring tool for MEMS fabrication. The laser pulses were varied between two different energy levels of 8mJ and 4mJ while the number of pulses for ablation was varied. The corresponding ablated depths were found to range between 11 µm and 49 µm, depending on the demagnified beam fluence.

  18. 248nm silicon photoablation: Microstructuring basics

    SciTech Connect

    Poopalan, P.; Najamudin, S. H.; Wahab, Y.; Mazalan, M.

    2015-05-15

    248nm pulses from a KrF excimer laser was used to ablate a Si wafer in order to ascertain the laser pulse and energy effects for use as a microstructuring tool for MEMS fabrication. The laser pulses were varied between two different energy levels of 8mJ and 4mJ while the number of pulses for ablation was varied. The corresponding ablated depths were found to range between 11 µm and 49 µm, depending on the demagnified beam fluence.

  19. 946 nm Diode Pumped Laser Produces 100mJ

    NASA Technical Reports Server (NTRS)

    Axenson, Theresa J.; Barnes, Norman P.; Reichle, Donald J., Jr.

    2000-01-01

    An innovative approach to obtaining high energy at 946 nm has yielded 101 mJ of laser energy with an optical-to-optical slope efficiency of 24.5%. A single gain module resonator was evaluated, yielding a maximum output energy of 50 mJ. In order to obtain higher energy a second gain module was incorporated into the resonator. This innovative approach produced un-surprised output energy of 101 mJ. This is of utmost importance since it demonstrates that the laser output energy scales directly with the number of gain modules. Therefore, higher energies can be realized by simply increasing the number of gain modules within the laser oscillator. The laser resonator incorporates two gain modules into a folded "M-shaped" resonator, allowing a quadruple pass gain within each rod. Each of these modules consists of a diode (stack of 30 microlensed 100 Watt diode array bars, each with its own fiber lens) end-pumping a Nd:YAG laser rod. The diode output is collected by a lens duct, which focuses the energy into a 2 mm diameter flat to flat octagonal pump area of the laser crystal. Special coatings have been developed to mitigate energy storage problems, including parasitic lasing and amplified spontaneous emission (ASE), and encourage the resonator to operate at the lower gain transition at 946 nm.

  20. Pressure Broadening of the Cadmium 326.1 nm Line

    NASA Astrophysics Data System (ADS)

    Roston, G. D.; Helmi, M. S.

    2014-11-01

    The temperature dependence of the Cd line absorption profile at 326.1nm perturbed by inert gases (Xe, Kr, Ar, Ne and He) has been carefully studied over a wide spectral range in both blue and red wings using a high-resolution double-beam spectrometer. The atomic densities of inert gases (Ngas) and cadmium (NCd) was sufficient to study the wing of the Cd line at 326.1nm. The temperature dependence of the studied line profile was analyzed in the framework of the quasi-static theory. The van der Waals coefficient differences (ΔC60 and ΔC61) between the ground X0+ state and the two excited states A30+ and B31 were obtained from the near red wing profile using Kuhn's law. All the results of the well depths with their positions for the ground (X0+), and the excited (31, 30+) were determined. The obtained results are compared with the corresponding theoretical and experimental molecular beam experiments results.

  1. Highly efficient CW intracavity frequency-doubled Yb:YAG-LBO laser at 515 nm under 968 nm diode laser pumping

    NASA Astrophysics Data System (ADS)

    Sun, G. C.; Li, Y. D.; Zhao, M.; Chen, X. Y.; Wang, J. B.; Chen, G. B.

    2011-05-01

    We describe the output performances of the 1030 nm transition in Yb:YAG under in-band pumping with diode laser at the 968 nm wavelength. An end-pumped Yb:YAG crystal yielded 1.93 W of continuous-wave (CW) output power for 9.1 W of absorbed pump power. The slope efficiency with respect to the absorbed pump power was 23.6%. Furthermore, 205 mW 515 nm green light was acquired by frequency doubling, resulting in an optical-to-optical efficiency with respect to the absorbed pump power of 2.7%. Comparative results obtained for the pump with diode laser at 940 nm are given in order to prove the advantages of the in-band pumping.

  2. Efficiency intracavity frequency-doubled Nd:CNGG-LBO green laser at 530.5 nm under direct 885 nm pumping into the emitting level

    NASA Astrophysics Data System (ADS)

    Liu, W. M.; Zhang, X.

    2011-10-01

    We report an efficient laser emission on the 1061 nm 4 F 3/2 to 4 I 11/2 transition in Nd:CNGG under the pump with diode laser at 885 nm. Continuous wave (CW) 5.4 W output power at 1061 nm is obtained under 17.4 W of incident pump power; the slope efficiency with respect to the incident pump power was 36.2%. Moreover, intracavity frequency doubling with LiB3O5 (LBO) nonlinear crystal yielded 1.75 W of green light at 530.5 nm. An optical-to-optical efficiency with respect to the incident pump power was 10.1%.

  3. Simultaneous Dual-Wavelength Operation of Nd-Doped Yttrium Orthovanadate Self-Raman Laser at 1175 nm and Undoped Gadolinium Orthovanadate Raman Laser at 1174 nm

    NASA Astrophysics Data System (ADS)

    Shen, Hongbin; Wang, Qingpu; Zhang, Xingyu; Zhang, Lei; Zhang, Chu; Chen, Xiaohan; Cong, Zhenhua; Bai, Fen; Liu, Zhaojun

    2013-04-01

    A diode-pumped actively Q-switched Nd-doped yttrium orthovanadate self-Raman emission at 1175 nm and undoped gadolinium orthovanadate Raman emission at 1174 nm dual-wavelength laser is demonstrated. With the pump power of 20.5 W and pulse repetition frequency of 20 kHz, the maximum dual-wavelength output power of 1.52 W was obtained, which contained a 0.71 W 1174 nm Raman laser component and a 0.81 W 1175 nm self-Raman laser component. The corresponding dual-wavelength Raman pulse width was 14.8 ns. Experimental results indicated that the dual-wavelength Raman laser with a small wavelength separation was effectively realized through simultaneous self-Raman and Raman shift.

  4. External-cavity diamond Raman laser performance at 1240 nm and 1485 nm wavelengths with high pulse energy

    NASA Astrophysics Data System (ADS)

    Pashinin, V. P.; Ralchenko, V. G.; Bolshakov, A. P.; Ashkinazi, E. E.; Gorbashova, M. A.; Yurov, V. Yu; Konov, V. I.

    2016-06-01

    We report on an external-cavity diamond Raman laser (DRL) pumped with a Q-switched Nd:YAG and generating at 1st and 2nd Stokes (1240 nm and 1485 nm) with enhanced output energy. The slope efficiency of 54% and output energy as high as 1.2 mJ in single pulse at 1240 nm have been achieved with optimized cavity, while the pulse energy of 0.70 mJ was obtained in the eye-safe spectral region at 1485 nm. Calculations of thermal lensing effect indicate it as a possible reason for the observed decrease in conversion efficiency at the highest pump energies.

  5. Electrically-pumped 850-nm micromirror VECSELs.

    SciTech Connect

    Geib, Kent Martin; Peake, Gregory Merwin; Serkland, Darwin Keith; Keeler, Gordon Arthur; Mar, Alan

    2005-02-01

    Vertical-external-cavity surface-emitting lasers (VECSELs) combine high optical power and good beam quality in a device with surface-normal output. In this paper, we describe the design and operating characteristics of an electrically-pumped VECSEL that employs a wafer-scale fabrication process and operates at 850 nm. A curved micromirror output coupler is heterogeneously integrated with AlGaAs-based semiconductor material to form a compact and robust device. The structure relies on flip-chip bonding the processed epitaxial material to an aluminum nitride mount; this heatsink both dissipates thermal energy and permits high frequency modulation using coplanar traces that lead to the VECSEL mesa. Backside emission is employed, and laser operation at 850 nm is made possible by removing the entire GaAs substrate through selective wet etching. While substrate removal eliminates absorptive losses, it simultaneously compromises laser performance by increasing series resistance and degrading the spatial uniformity of current injection. Several aspects of the VECSEL design help to mitigate these issues, including the use of a novel current-spreading n type distributed Bragg reflector (DBR). Additionally, VECSEL performance is improved through the use of a p-type DBR that is modified for low thermal resistance.

  6. High-power 266?nm ultraviolet generation in yttrium aluminum borate

    NASA Astrophysics Data System (ADS)

    Liu, Qiang; Yan, Xingpeng; Gong, Mali; Liu, Hua; Zhang, Ge; Ye, Ning

    2011-07-01

    A yttrium aluminum borate [YAl3(BO3)4] (YAB) crystal with UV cutoff wavelength of 165nm is used as the nonlinear optical crystal for fourth harmonic generation. The fundamental frequency laser at 1064nm from an Nd:YVO4 master oscillator power amplifier laser was frequency doubled to 532nm. Using the type I phase-matching YAB crystal, a 5.05W average power 266nm UV laser was obtained at the pulse repetition frequency of 65kHz, corresponding to the conversion efficiency of 12.3% from 532 to 266nm. The experimental results show great potential for the application of using YAB as a nonlinear optical crystal to get high-power fourth harmonic generation.

  7. Theoretical and experimental research on the ˜980-nm Yb-doped fiber laser

    NASA Astrophysics Data System (ADS)

    Wang, Yanshan; Ke, Weiwei; Ma, Yi; Sun, Yinhong; Feng, Yujun

    2016-07-01

    The output properties of the ˜980-nm Yb-doped fiber laser versus pump power and core-cladding ratio of gain fiber, also the amplified spontaneous emission (ASE) at different wavelengths of seed laser, are investigated theoretically. An all-fiber amplifier based on different wavelengths of seed laser at 974.4, 977, and 981.7 nm brings the studies on parasitic oscillation and ASE in the ˜980-nm Yb-doped fiber amplifier. Through the theoretical and experimental research, we found that the controlling of three-level ASE around ˜980-nm is pivotal for obtaining a high-power 980-nm Yb-doped fiber amplifier.

  8. High power single-longitudinal-mode cyan laser at 500.8 nm

    NASA Astrophysics Data System (ADS)

    Hao, E. J.; Li, T.; Wang, Z. D.

    2012-05-01

    An all-solid-state single-longitudinal-mode (SLM) laser at 500.8 nm with 830 mW output power has been demonstrated for the first time. By using a new resonator for doubly resonant, Nd:GdVO4 and Nd:YAG were pumped by two laser diode arrays coupled by optical fiber, respectively. In the two sub-cavities, SLM wavelengths of 1064 and 946 nm were induced by using the twisted-mode technique and then mixed into SLM 500.8 nm laser with sum-frequency technology. The SLM 500.8 nm laser output of 830 mW was obtained at the incident pump power of 20 W for Nd:GdVO4 and 23 W for Nd:YAG. The experimental results showed that the intracavity sum-frequency mixing by twisted-mode technique is an effective method for SLM 500.8 nm laser.

  9. 494 nm blue laser based on sum-frequency mixing of diode pumped Nd3+ lasers

    NASA Astrophysics Data System (ADS)

    Zou, J.; Wang, L. R.

    2012-02-01

    We report for the first time a continuous-wave (CW) blue radiation at 494 nm by intracavity sumfrequency generation of 912 nm Nd:GdVO4 laser and 1079 nm Nd:YAlO3 (Nd:YAP) laser. Using type-I critical phase matching LiB3O5 (LBO) crystal, 494 nm blue laser was obtained by 912 and 1079 nm intra-cavity sum-frequency mixing, and output power of 179 mW was demonstrated. At the output power level of 179 mW, the output power stability is better than 3.5% and laser beam quality M 2 factor is 1.21.

  10. Radiometric Quality of the MODIS Bands at 667 and 678nm

    NASA Technical Reports Server (NTRS)

    Meister, Gerhard; Franz, Bryan A.

    2010-01-01

    The MODIS instruments on Terra and Aqua were designed to allow the measurement of chlorophyll fluorescence effects over ocean. The retrieval algorithm is based on the difference between the water-leaving radiances at 667nm and 678nm. The water-leaving radiances at these wavelengths are usually very low relative to the top- of-atmosphere radiances. The high radiometric accuracy needed to retrieve the small fluorescence signal lead to a dual gain design for the 667 and 678nm bands. This paper discusses the benefits obtained from this design choice and provides justification for the use of only one set of gains for global processing of ocean color products. Noise characteristics of the two bands and their related products are compared to other products of bands from 412nm to 2130nm. The impact of polarization on the two bands is discussed. In addition, the impact of stray light on the two bands is compared to other MODIS bands.

  11. Radiometric Quality of the MODIS Bands at 667 and 678nm

    NASA Technical Reports Server (NTRS)

    Meister, Gerhard; Franz, Bryan A.

    2011-01-01

    The MODIS instruments on Terra and Aqua were designed to allow the measurement of chlorophyll fluorescence effects over ocean. The retrieval algorithm is based on the difference between the water-leaving radiances at 667nm and 678nm. The water-leaving radiances at these wavelengths are usually very low relative to the top-of-atmosphere radiances. The high radiometric accuracy needed to retrieve the small fluorescence signal lead to a dual gain design for the 667 and 678nm bands. This paper discusses the benefits obtained from this design choice and provides justification for the use of only one set of gains for global processing of ocean color products. Noise characteristics of the two bands and their related products are compared to other products of bands from 412nm to 2130nm. The impact of polarization on the two bands is discussed. In addition, the impact of stray light on the two bands is compared to other MODIS bands.

  12. Efficient emission at 1908 nm in a diode-pumped Tm:YLF laser

    SciTech Connect

    Zakharov, N G; Antipov, Oleg L; Savikin, A P; Sharkov, V V; Eremeikin, O N; Frolov, Yu N; Mishchenko, G M; Velikanov, S D

    2009-05-31

    Emission parameters at 1908 nm in a longitudinally-diode-pumped Tm:YLF laser are studied. The laser parameters are optimised to obtain the maximal power of high-quality cw radiation. The output power of {approx}27 W is obtained at the slope efficiency of {approx}50% and total optical pump conversion efficiency of {approx}41%. (lasers and amplifiers)

  13. TCSPC FLIM in the wavelength range from 800 nm to 1700 nm (Conference Presentation)

    NASA Astrophysics Data System (ADS)

    Becker, Wolfgang; Shcheslavsky, Vladislav

    2016-03-01

    Excitation and detection in the wavelength range above 800nm is a convenient and relatively inexpensive way to increase the penetration depth in optical microscopy. Moreover, detection at long wavelength avoids the problem that tissue autofluorescence contaminates the signals from endogenous fluorescence probes. FLIM at NIR wavelength may therefore be complementary to multiphoton microscopy, especially if the lifetimes of NIR fluorophores report biological parameters of the tissue structures they are bound to. Unfortunately, neither the excitation sources nor the detectors of standard confocal and multiphoton laser scanning systems are directly suitable for excitation and detection of NIR fluorescence. Most of these problems can be solved, however, by using ps diode lasers or Ti:Sapphire lasers at their fundamental wavelength, and NIR-sensitive detectors. With NIR-sensitive PMTs the detection wavelength range can be extended up to 900 nm, with InGaAs SPAD detectors up to 1700 nm. Here, we demonstrate the use of a combination of laser scanning, multi-dimensional TCSPC, and advanced excitation sources and detectors for FLIM at up to 1700 nm. The performance was tested at tissue samples incubated with NIR dyes. The fluorescence lifetimes generally get shorter with increasing absorption and emission wavelengths of the dyes. For the cyanine dye IR1061, absorbing around 1060 nm, the lifetime was found to be as short as 70 ps. Nevertheless the fluorescence decay could still be clearly detected. Almost all dyes showed clear lifetime changes depending on the binding to different tissue constituents.

  14. Comparison of 980-nm and 1070-nm in endovenous laser treatment (EVLT)

    NASA Astrophysics Data System (ADS)

    Topaloglu, Nermin; Tabakoglu, Ozgur; Ergenoglu, Mehmet U.; Gülsoy, Murat

    2009-07-01

    The use of endovenous laser treatment for varicose veins has been increasing in recent years. It is a safer technique than surgical vein stripping. Its complications (e.g. bruising, pain) are less than the complications of surgical vein stripping. But best parameters such as optimum wavelength, power, and application duration are still under investigation to clarify uncertainties about this technique. To prevent its complications and improve its clinical outcomes, the exact mechanism of it has to be known. The aim of this study is to investigate the effect of different laser wavelengths on endovenous laser therapy. In this study 980-nm diode laser and 1070-nm fiber laser were used. Human veins were irradiated with 980-nm and 1070-nm lasers at 8 W and 10 W to find the optimal power and wavelength. After laser application, remarkable shrinkage was observed. Inner and outer diameters of the veins also narrowed for both of the laser types. 10 W of 980-nm laser application led to better shrinkage results.

  15. High power diode lasers emitting from 639 nm to 690 nm

    NASA Astrophysics Data System (ADS)

    Bao, L.; Grimshaw, M.; DeVito, M.; Kanskar, M.; Dong, W.; Guan, X.; Zhang, S.; Patterson, J.; Dickerson, P.; Kennedy, K.; Li, S.; Haden, J.; Martinsen, R.

    2014-03-01

    There is increasing market demand for high power reliable red lasers for display and cinema applications. Due to the fundamental material system limit at this wavelength range, red diode lasers have lower efficiency and are more temperature sensitive, compared to 790-980 nm diode lasers. In terms of reliability, red lasers are also more sensitive to catastrophic optical mirror damage (COMD) due to the higher photon energy. Thus developing higher power-reliable red lasers is very challenging. This paper will present nLIGHT's released red products from 639 nm to 690nm, with established high performance and long-term reliability. These single emitter diode lasers can work as stand-alone singleemitter units or efficiently integrate into our compact, passively-cooled Pearl™ fiber-coupled module architectures for higher output power and improved reliability. In order to further improve power and reliability, new chip optimizations have been focused on improving epitaxial design/growth, chip configuration/processing and optical facet passivation. Initial optimization has demonstrated promising results for 639 nm diode lasers to be reliably rated at 1.5 W and 690nm diode lasers to be reliably rated at 4.0 W. Accelerated life-test has started and further design optimization are underway.

  16. Dual illumination OCT at 1050nm and 840nm for whole eye segment imaging

    NASA Astrophysics Data System (ADS)

    Fan, Shanhui; Qin, Lin; Dai, Cuixia; Zhou, Chuanqing

    2014-11-01

    We presented an improved dual channel dual focus spectral domain optical coherence tomography (SD-OCT) with two illuminations at 840 nm and 1050 nm for whole eye segment imaging and biometry in vivo. The two light beams were coupled and optically optimized to scan the anterior and posterior segment of the eye simultaneously. This configuration with dichroic mirrors integrated in the sample arm enables us to acquire images from the anterior segment and retina effectively with minimum loss of sample signal. In addition, the full resolved complex (FRC) method was applied to double the imaging depth for the whole anterior segment imaging by eliminating the mirror image. The axial resolution for 1050 nm and 840 nm OCT was 14 μm and 8 μm in air, respectively. Finally, the system was successfully tested in imaging the unaccommodated and accommodated eyes. The preliminary results demonstrated the significant improvements comparing with our previous dual channel SD-OCT configuration in which the two probing beams had the same central wavelength of 840 nm.

  17. First size-dependent growth rate measurements of 1 to 5 nm freshly formed atmospheric nuclei

    NASA Astrophysics Data System (ADS)

    Kuang, C.; Chen, M.; Zhao, J.; Smith, J.; McMurry, P. H.; Wang, J.

    2011-09-01

    This study presents the first measurements of size-dependent particle diameter growth rates for freshly nucleated particles down to 1 nm geometric diameter. Data analysis methods were developed, de-coupling the size and time-dependence of particle growth rates by fitting the aerosol general dynamic equation to size distributions obtained at an instant in time. Size distributions of freshly nucleated particles were measured during two intensive measurement campaigns in different environments (Atlanta, GA and Boulder, CO) using a recently developed electrical mobility spectrometer with a diethylene glycol-based ultrafine condensation particle counter as the detector. Size and time-dependent growth rates were obtained directly from measured size distributions and were found to increase approximately linearly with size from ~1 to 3 nm geometric diameter, ranging, for example, from 5.6 ± 2.0 to 27 ± 5.3 nm h-1 in Boulder (13:00) and from 5.5 ± 0.82 to 7.6 ± 0.56 nm h-1 in Atlanta (13:00). The resulting growth rate enhancement Γ, defined as the ratio of the observed growth rate to the growth rate due to the condensation of sulfuric acid only, was found to increase approximately linearly with size from ~1 to 3 nm geometric diameter, having lower limit values that approached ~1 at 1.2 nm geometric diameter in Atlanta and ~3 at 0.8 nm geometric diameter in Boulder, and having upper limit values that reached 8.3 at 4.1 nm geometric diameter in Atlanta and 25 at 2.7 nm geometric diameter in Boulder. Survival probability calculations comparing constant and size-dependent growth indicate that neglecting the strong growth rate size dependence from 1 to 3 nm observed in this study could lead to a significant overestimation of CCN survival probability.

  18. 308-nm excimer laser in endodontics

    NASA Astrophysics Data System (ADS)

    Liesenhoff, Tim

    1992-06-01

    Root canal preparation was performed on 20 extracted human teeth. After opening the coronal pulp, the root canals were prepared by 308 nm excimer laser only. All root canals were investigated under SEM after separation in the axial direction. By sagittal separation of the mandibles of freshly slaughtered cows, it was possible to get access to the tissues and irradiate under optical control. Under irradiation of excimer laser light, tissue starts to fluoresce. It was possible to demonstrate that each tissue (dentin, enamel, bone, pulpal, and connective tissue) has a characteristic spectral pattern. The SEM analyses showed that it is well possible to prepare root canals safely. All organic soft tissue has been removed by excimer laser irradiation. There was no case of via falsa. The simultaneous spectroscopic identification of the irradiated tissue provides a safe protection from overinstrumentation. First clinical trials on 20 patients suffering of chronical apical parodontitis have been carried out successfully.

  19. 1064-nm Nd:YAG laser nucleotomy

    NASA Astrophysics Data System (ADS)

    Vari, Sandor G.; Pergadia, Vani R.; Shi, Wei-Qiang; Snyder, Wendy J.; Fishbein, Michael C.; Grundfest, Warren S.

    1993-07-01

    The high incidence of patients with clinical and neurological symptoms of lumbar disc herniation has spurred the development of less invasive and more cost efficient methods to treat patients. In this study we evaluated pulsed and continuous wave (cw) 1064 nm Nd:YAG laser ablation and induced thermal damage in sheep intervertebral disc. We used the Heraeus LaserSonics Hercules 5040 (Nd:YAG) laser system and 400 micrometers bare and 600 micrometers ball-tipped fibers in cw and pulsed mode. For the laser parameters and fibers used in this study, ablation of the intervertebral disc was successful and thermal damage did not exceed 0.5 mm. Varying beam diameters and focusing abilities (i.e., bare and ball) did not produce any difference in the coagulation thermal effect.

  20. Preliminary characterisation of new glass reference materials (GSA-1G, GSC-1G, GSD-1G and GSE-1G) by laser ablation-inductively coupled plasma-mass spectrometry using 193 nm, 213 nm and 266 nm wavelengths

    USGS Publications Warehouse

    Guillong, M.; Hametner, K.; Reusser, E.; Wilson, S.A.; Gunther, D.

    2005-01-01

    New glass reference materials GSA-1G, GSC-1G, GSD-1G and GSE-1G have been characterised using a prototype solid state laser ablation system capable of producing wavelengths of 193 nm, 213 nm and 266 nm. This system allowed comparison of the effects of different laser wavelengths under nearly identical ablation and ICP operating conditions. The wavelengths 213 nm and 266 nm were also used at higher energy densities to evaluate the influence of energy density on quantitative analysis. In addition, the glass reference materials were analysed using commercially available 266 nm Nd:YAG and 193 nm ArF excimer lasers. Laser ablation analysis was carried out using both single spot and scanning mode ablation. Using laser ablation ICP-MS, concentrations of fifty-eight elements were determined with external calibration to the NIST SRM 610 glass reference material. Instead of applying the more common internal standardisation procedure, the total concentration of all element oxide concentrations was normalised to 100%. Major element concentrations were compared with those determined by electron microprobe. In addition to NIST SRM 610 for external calibration, USGS BCR-2G was used as a more closely matrix-matched reference material in order to compare the effect of matrix-matched and non matrix-matched calibration on quantitative analysis. The results show that the various laser wavelengths and energy densities applied produced similar results, with the exception of scanning mode ablation at 266 nm without matrix-matched calibration where deviations up to 60% from the average were found. However, results acquired using a scanning mode with a matrix-matched calibration agreed with results obtained by spot analysis. The increased abundance of large particles produced when using a scanning ablation mode with NIST SRM 610, is responsible for elemental fractionation effects caused by incomplete vaporisation of large particles in the ICP.

  1. Surface micromachined MEMS tunable VCSEL at 1550 nm with > 70 nm single mode tuning

    NASA Astrophysics Data System (ADS)

    Gierl, Christian; Gründl, Tobias; Debernardi, Pierluigi; Zogal, Karolina; Davani, Hooman A.; Grasse, Christian; Böhm, Gerhard; Meissner, Peter; Küppers, Franko; Amann, Markus-Christian

    2012-03-01

    We present surface micro-machined tunable vertical-cavity surface-emitting lasers (VCSELs) operating around 1550nm with tuning ranges up to 100nm and side mode suppression ratios beyond 40 dB. The output power reaches 3.5mW at 1555 nm. The electro-thermal and the electro-statical actuation of a micro electro-mechanical system (MEMS) movable distributed Bragg reflector (DBR) membrane increases/decreases the cavity length which shifts the resonant wavelength of the cavity to higher/lower values. The wavelength is modulated with 200 Hz/120 kHz. Both tuning mechanisms can be used simultaneously within the same device. The newly developed surface micro-machining technology uses competitive dielectric materials for the MEMS, deposited with low temperature plasma enhanced chemical vapor deposition (PECVD), which is cost effective and capable for on wafer mass production.

  2. Compact 498-nm light source based on intracavity sum-frequency Nd:GGG laser

    NASA Astrophysics Data System (ADS)

    Wang, A. G.; Li, Y. L.

    2011-08-01

    We report a coherent cyan radiation at 498 nm by intracavity sum-frequency generation of the 937 and 1062 nm laser-lines of the Nd:GGG crystal. With a diode pump power of 18.2 W, the maximum cyan output power of 186 mW is obtained. The beam quality M2 value is 1.22 in the horizontal plane. The output power stability over 30 min is better than 5%. To the best of our knowledge, this is first work on intracavity sum-frequency generation of a diode pumped Nd:GGG laser at 498 nm.

  3. 219.3 W CW diode-side-pumped 1123 nm Nd:YAG laser

    NASA Astrophysics Data System (ADS)

    Li, C. Y.; Bo, Y.; Xu, Y. T.; Yang, F.; Wang, Z. C.; Wang, B. S.; Xu, J. L.; Gao, H. W.; Peng, Q. J.; Cui, D. F.; Xu, Z. Y.

    2010-07-01

    We demonstrate a high power continuous wave (CW) diode-side-pumped Nd:YAG laser operating at 1123 nm with a plano-plano configuration. By means of precise coating, a single 1123 nm wavelength is achieved. Under the pump power of 1080 W, an output power of 219.3 W is obtained, which corresponds to an optical-optical conversion efficiency of 20.3%. To the best of our knowledge, this is the highest output power for CW 1123 nm laser based on Nd:YAG crystal.

  4. 93.7 W 1112 nm diode-side-pumped CW Nd:YAG laser

    NASA Astrophysics Data System (ADS)

    Li, C. Y.; Wang, Z. C.; Xu, Y. T.; Yang, F.; Wang, B. S.; Gao, H. W.; Bo, Y.; Peng, Q. J.; Cui, D. F.; Xu, Z. Y.

    2010-07-01

    We demonstrate a high power continuous wave (CW) infrared laser operated at 1112 nm from a diode side-pumped Nd:YAG crystal with a plano-plano symmetrical resonator. By inserting an etalon, an output power of as high as 93.7 W at 1112 nm was obtained at the pump power of 570 W with conversion efficiency of 16.4%. The beam quality factor of M2 was measured to be about 17. The wavelength tunable performance of the etalon was also analyzed. To the best of our knowledge, it is the highest output power at 1112 nm CW laser based on Nd:YAG crystal.

  5. Absorption Measurements of Periodically Poled Potassium Titanyl Phosphate (PPKTP) at 775 nm and 1550 nm

    PubMed Central

    Steinlechner, Jessica; Ast, Stefan; Krüger, Christoph; Singh, Amrit Pal; Eberle, Tobias; Händchen, Vitus; Schnabel, Roman

    2013-01-01

    The efficient generation of second-harmonic light and squeezed light requires non-linear crystals that have low absorption at the fundamental and harmonic wavelengths. In this work the photo-thermal self-phase modulation technique is exploited to measure the absorption coefficient of periodically poled potassium titanyl phosphate (PPKTP) at 1,550 nm and 775 nm. The measurement results are (84±40) ppm/cm and (127±24) ppm/cm, respectively. We conclude that the performance of state-of-the-art frequency doubling and squeezed light generation in PPKTP is not limited by absorption. PMID:23291574

  6. The Doubling of 846 nm Light to Produce 423 nm Light for use in Atom Interferometry

    NASA Astrophysics Data System (ADS)

    Archibald, James; Birrell, Jeremey; Tang, Rebecca; Erickson, Chris; Goggins, Landon; Durfee, Dallin

    2009-10-01

    We present progress on a 423 nm fluorescence probe/cooling laser for use in our neutral calcium atom interferometer. The finished system will include an 846 nm diode laser that is coupled to a tapered amplifier. This light will be sent to a buildup cavity where we will achieve second-harmonic generation (SHG) using either a BBO non-linear crystal or a periodically-poled KTP crystal. We will discuss the theoretical considerations relating to the doubling of light in a crystal and the construction of our buildup cavity. We will also discuss its proposed application for use in atom interferometry.

  7. Measurement of 100 nm and 60 nm Particle Standards by Differential Mobility Analysis

    PubMed Central

    Mulholland, George W.; Donnelly, Michelle K.; Hagwood, Charles R.; Kukuck, Scott R.; Hackley, Vincent A.; Pui, David Y. H.

    2006-01-01

    The peak particle size and expanded uncertainties (95 % confidence interval) for two new particle calibration standards are measured as 101.8 nm ± 1.1 nm and 60.39 nm ± 0.63 nm. The particle samples are polystyrene spheres suspended in filtered, deionized water at a mass fraction of about 0.5 %. The size distribution measurements of aerosolized particles are made using a differential mobility analyzer (DMA) system calibrated using SRM® 1963 (100.7 nm polystyrene spheres). An electrospray aerosol generator was used for generating the 60 nm aerosol to almost eliminate the generation of multiply charged dimers and trimers and to minimize the effect of non-volatile contaminants increasing the particle size. The testing for the homogeneity of the samples and for the presence of multimers using dynamic light scattering is described. The use of the transfer function integral in the calibration of the DMA is shown to reduce the uncertainty in the measurement of the peak particle size compared to the approach based on the peak in the concentration vs. voltage distribution. A modified aerosol/sheath inlet, recirculating sheath flow, a high ratio of sheath flow to the aerosol flow, and accurate pressure, temperature, and voltage measurements have increased the resolution and accuracy of the measurements. A significant consideration in the uncertainty analysis was the correlation between the slip correction of the calibration particle and the measured particle. Including the correlation reduced the expanded uncertainty from approximately 1.8 % of the particle size to about 1.0 %. The effect of non-volatile contaminants in the polystyrene suspensions on the peak particle size and the uncertainty in the size is determined. The full size distributions for both the 60 nm and 100 nm spheres are tabulated and selected mean sizes including the number mean diameter and the dynamic light scattering mean diameter are computed. The use of these particles for calibrating DMAs and for

  8. Study of EUVL mask defect inspection using 199-nm inspection tool with super-resolution method

    NASA Astrophysics Data System (ADS)

    Shigemura, Hiroyuki; Amano, Tsuyoshi; Arisawa, Yukiyasu; Suga, Osamu; Hashimoto, Hideaki; Saito, Masanori; Takeda, Masaya; Kikuiri, Nobutaka; Hirano, Ryoichi

    2009-10-01

    In this paper, we will report on our experimental results on the impact of inspection system optics on mask defect detection sensitivity. We evaluated the capability of detecting defects on the EUVL masks by using a new inspection tool (NPI6000EUVα) made by NuFlare Technology, Inc. (NFT) and Advanced Mask Inspection Technology, Inc. (AMiT). This tool is based on NPI-5000 which is the leading-edge photomask defect inspection system using 199nm wavelength inspection optics. The programmed defect mask with LR-TaBN absorber was used which had various sized opaque and clear extension defects on hp-180nm, hp-128nm, and hp-108nm line and space patterns. According to the analysis, to obtain optimum sensitivity for various types of defects, using both C- and P-polarized illumination conditions were found to be effective. At present, sufficient defect-detection sensitivity is achieved for opaque and clear extension defects in hp128nm (hp32nm at wafer). For hp108nm (hp27nm at wafer), using both C- and P- polarized illumination is effective. However, further developments in defect-detection sensitivity are necessary.

  9. 635nm diode laser biostimulation on cutaneous wounds

    NASA Astrophysics Data System (ADS)

    Solmaz, Hakan; Gülsoy, Murat; Ülgen, Yekta

    2014-05-01

    Biostimulation is still a controversial subject in wound healing studies. The effect of laser depends of not only laser parameters applied but also the physiological state of the target tissue. The aim of this project is to investigate the biostimulation effects of 635nm laser irradiation on the healing processes of cutaneous wounds by means of morphological and histological examinations. 3-4 months old male Wistar Albino rats weighing 330 to 350 gr were used throughout this study. Low-level laser therapy was applied through local irradiation of red light on open skin excision wounds of 5mm in diameter prepared via punch biopsy. Each animal had three identical wounds on their right dorsal part, at which two of them were irradiated with continuous diode laser of 635nm in wavelength, 30mW of power output and two different energy densities of 1 J/cm2 and 3 J/cm2. The third wound was kept as control group and had no irradiation. In order to find out the biostimulation consequences during each step of wound healing, which are inflammation, proliferation and remodeling, wound tissues removed at days 3, 7, 10 and 14 following the laser irradiation are morphologically examined and than prepared for histological examination. Fragments of skin including the margin and neighboring healthy tissue were embedded in paraffin and 6 to 9 um thick sections cut are stained with hematoxylin and eosin. Histological examinations show that 635nm laser irradiation accelerated the healing process of cutaneous wounds while considering the changes of tissue morphology, inflammatory reaction, proliferation of newly formed fibroblasts and formation and deposition of collagen fibers. The data obtained gives rise to examine the effects of two distinct power densities of low-level laser irradiation and compare both with the non-treatment groups at different stages of healing process.

  10. 10nm three-dimensional CD-SEM metrology

    NASA Astrophysics Data System (ADS)

    Vladár, András. E.; Villarrubia, John S.; Chawla, Jasmeet; Ming, Bin; Kline, Joseph R.; List, Scott; Postek, Michael T.

    2014-04-01

    The shape and dimensions of a challenging pattern have been measured using a model-based library scanning electron microscope (MBL SEM) technique. The sample consisted of a 4-line repeating pattern. Lines were narrow (10 nm), asymmetric (different edge angles and significant rounding on one corner but not the other), and situated in a complex neighborhood, with neighboring lines as little as 10 nm or as much as 28 nm distant. The shape cross-section determined by this method was compared to transmission electron microscopy (TEM) and critical dimension small angle x-ray scattering (CD-SAXS) measurements of the same sample with good agreement. A recently-developed image composition method was used to obtain sharp SEM images, in which blur from vibration and drift were minimized. A Monte Carlo SEM simulator (JMONSEL) produced a model-based library that was interpolated to produce the best match to measured SEM images. Three geometrical and instrument parameterizations were tried. The first was a trapezoidal geometry. In the second one corner was significantly rounded. In the last, the electron beam was permitted to arrive with stray tilt. At each stage, the fit to the data improved by a statistically significant amount, demonstrating that the measurement remained sensitive to the new parameter. Because the measured values represent the average unit cell, the associated repeatabilities are at the tenths of a nanometer level, similar to scatterometry and other area-averaging techniques, but the SEM's native high spatial resolution also permitted observation of defects and other local departures from the average.

  11. Transcanalicular laser dacryocystorhinostomy using low energy 810 nm diode laser

    PubMed Central

    Gupta, Sanjiv K.; Kumar, Ajai; Agarwal, Swati; Pandey, Paritosh

    2012-01-01

    Background: Hypertrophic scarring may be a cause of failure after transcanalicular laser dacryocystorhinostomy (DCR) surgery. This hypertrophic scarring results from tissue charring and excessive coagulation, which may be caused by the high laser energy. We have evaluated the use of low energy settings to prevent hypertrophic scarring, for a successful outcome. Aims: To perform and evaluate transcanalicular laser DCR using low energy 810 nm diode laser. Design: Interventional, non-comparative, case series. Materials and Methods: Patients with nasolacrimal duct obstruction and chronic dacryocystitis, who needed DCR, and were fit for surgery under local anesthesia, were recruited to undergo transcanalicular laser DCR using a 810 nm diode laser. The outcome was measured by the patency of the lacrimal passage, as indicated by the relief in the symptoms and the patency on syringing at the last follow-up. The surgical time and surgical complications were noted. Statistical Analysis Used: Descriptive analysis. Results: The study included 94 patients. The average age was 30.1 years (range 15 - 69 years). Seventy (74.4%) patients were female. Eight patients had failed external DCR. Per-operative patency of the passage was obtained in all the patients. Average surgical time was seven minutes (5 – 18 minutes). At the end of the study period of one year, a successful outcome was seen in 85 patients (90.5%). There were eight patients of previous failed DCR surgeries, and six of them achieved a cure at the end of follow-up. Conclusions: Transcanalicular Laser DCR can be safely performed using a low power 810 nm diode laser. The surgery is elegant, minimally invasive, allows fast rehabilitation, and has an excellent success rate. PMID:23439888

  12. Size and Purity Control of HPHT Nanodiamonds down to 1 nm

    PubMed Central

    2015-01-01

    High-pressure high-temperature (HPHT) nanodiamonds originate from grinding of diamond microcrystals obtained by HPHT synthesis. Here we report on a simple two-step approach to obtain as small as 1.1 nm HPHT nanodiamonds of excellent purity and crystallinity, which are among the smallest artificially prepared nanodiamonds ever shown and characterized. Moreover we provide experimental evidence of diamond stability down to 1 nm. Controlled annealing at 450 °C in air leads to efficient purification from the nondiamond carbon (shells and dots), as evidenced by X-ray photoelectron spectroscopy, Raman spectroscopy, photoluminescence spectroscopy, and scanning transmission electron microscopy. Annealing at 500 °C promotes, besides of purification, also size reduction of nanodiamonds down to ∼1 nm. Comparably short (1 h) centrifugation of the nanodiamonds aqueous colloidal solution ensures separation of the sub-10 nm fraction. Calculations show that an asymmetry of Raman diamond peak of sub-10 nm HPHT nanodiamonds can be well explained by modified phonon confinement model when the actual particle size distribution is taken into account. In contrast, larger Raman peak asymmetry commonly observed in Raman spectra of detonation nanodiamonds is mainly attributed to defects rather than to the phonon confinement. Thus, the obtained characteristics reflect high material quality including nanoscale effects in sub-10 nm HPHT nanodiamonds prepared by the presented method. PMID:26691647

  13. Generation of femtosecond laser pulses tunable from 380 nm to 465 nm via cascaded nonlinear optical mixing in a noncollinear optical parametric amplifier with a type-I phase matched BBO crystal.

    PubMed

    Lee, Chao-Kuei; Zhang, Jing-Yuan; Huang, J; Pan, Ci-Ling

    2003-07-14

    We report the generation of tunable femtosecond pulses from 380nm to 465nm near the degenerate point of a 405-nm pumped type-I BBO noncollinearly phase-matched optical parametric amplifier (NOPA). The tunable UV/blue radiation is obtained from sum frequency generation (SFG) between the OPA output and the residual fundamental beam at 810-nm and cascaded second harmonic generation (SHG) of OPA. With a fixed seeding angle, the generated SFG and SHG covers from 385 nm to 465-nm. With a pumping energy of 75 J at 405 nm, the optical conversion efficiency from the pump to the tunable SFG is more than 5% and the efficiency of SHG of the OPA is about 2%. PMID:19466049

  14. 1060nm 28-Gbps VCSEL developed at Furukawa

    NASA Astrophysics Data System (ADS)

    Suzuki, Toshihito; Funabashi, Masaki; Shimizu, Hitoshi; Nagashima, Kazuya; Kamiya, Shinichi; Kasukawa, Akihiko

    2014-02-01

    This paper presents recent development results of our 28-Gbps VCSELs featured with double intra-cavity structure and a lasing wavelength of 1060 nm. The double intra-cavity realizes very low cavity loss due to undoped semiconductor bottom DBR and dielectric top DBR layers. Compressively strained InGaAs MQW provides high differential gain that contributes to low power consumption and high reliability. Based on our 10-Gbps VCSEL structure, we carefully optimized MQW, selective oxide structure, cavity length, and doping profile in order to achieve high speed operation while maintaining high reliability and other laser performances. The developed VCSELs exhibit modulation 3 dB-bandwidth exceeding 20 GHz and D-factor of 10 GHz/(mA)1/2. Typical threshold current and slope efficiency are 0.5 mA and 0.5 W/A, respectively. The paper also discusses static and dynamic characteristics of VCSELs with various oxide aperture sizes simultaneously fabricated on the same wafer. For a longer transmission distance and better optical coupling to a multimode fiber, optical lateral confinement is precisely controlled to reduce spectral width as well as far-field pattern. Clearly opened eye diagrams are obtained at a bit rate of 28 Gbps. Bit error rate tests are also performed and 28 Gbps error free transmission has been confirmed over 300 meters of multimode-fiber optimized for 1060 nm with a PRBS pattern length of 231-1.

  15. Quality metric for accurate overlay control in <20nm nodes

    NASA Astrophysics Data System (ADS)

    Klein, Dana; Amit, Eran; Cohen, Guy; Amir, Nuriel; Har-Zvi, Michael; Huang, Chin-Chou Kevin; Karur-Shanmugam, Ramkumar; Pierson, Bill; Kato, Cindy; Kurita, Hiroyuki

    2013-04-01

    The semiconductor industry is moving toward 20nm nodes and below. As the Overlay (OVL) budget is getting tighter at these advanced nodes, the importance in the accuracy in each nanometer of OVL error is critical. When process owners select OVL targets and methods for their process, they must do it wisely; otherwise the reported OVL could be inaccurate, resulting in yield loss. The same problem can occur when the target sampling map is chosen incorrectly, consisting of asymmetric targets that will cause biased correctable terms and a corrupted wafer. Total measurement uncertainty (TMU) is the main parameter that process owners use when choosing an OVL target per layer. Going towards the 20nm nodes and below, TMU will not be enough for accurate OVL control. KLA-Tencor has introduced a quality score named `Qmerit' for its imaging based OVL (IBO) targets, which is obtained on the-fly for each OVL measurement point in X & Y. This Qmerit score will enable the process owners to select compatible targets which provide accurate OVL values for their process and thereby improve their yield. Together with K-T Analyzer's ability to detect the symmetric targets across the wafer and within the field, the Archer tools will continue to provide an independent, reliable measurement of OVL error into the next advanced nodes, enabling fabs to manufacture devices that meet their tight OVL error budgets.

  16. 650 nm Laser stimulated dating from Side Antique Theatre, Turkey

    NASA Astrophysics Data System (ADS)

    Doğan, M.; Meriç, N.

    2014-03-01

    Samples were taken from the archeological excavation site, which was at the backs of the Side Antique Theatre. Samples were taken from under the base rock in this area. Polymineral fine grains were examined to determine the ages of the sediments. Samples gathered from the Side Antique Theatre were investigated through using the SAR method. Firstly, one part of the samples were evaluated by using conventional IRSL reading head model of (ELSEC-9010) which is infrared (880±80 nm) stimulation source with Schott BG39 filter. The IRSL age dating with feldspar minerals, gives a number of overestimated or underestimated age values as a result. A new reading head was proposed with the following configuration attachments for overestimation of equivalent dose rates. Measurements were done with this newly designed red laser stimulating reading head which works with Elsec 9010 OSL age dating system. SAR measurements were performed by (650±10 nm) red laser light source with two Schott BG3 filters. With usage of the new designed reading head; closer results were obtained in comparision with the Antique Theatre's expected age range. Fading rates were taken into consideration and these corrections were also handled for true age results.

  17. Comparison of 1470nm laser and 1470nm laser heat head for ex-vivo kidney tissue cutting: a preliminary study

    NASA Astrophysics Data System (ADS)

    Zhou, Zhentian; Zhang, Lupeng; Liu, Jiafeng; Shun, Zhi; Li, Wenzhi; Liu, Zhuwen; Liang, Zhiyuan

    2014-11-01

    Purpose: Compare of the efficiency of 1470nm laser and 1470nm laser heat head for tissue cutting in vitro porcine kidney tissue . Method: We designed a laser heat head that convert laser energy into thermal energy by the absorbing materials. Fresh kidney tissue was harvested from a porcine and then placed on a turntable with constant speed . The same power of 1470nm laser and 1470nm laser heat head was used to cutting tissue, respectively .The cutting results and the range of thermal damage was compared after cutting . Result: Compared with 1470nm laser, 1470nm laser heat head's cutting traces is more smooth and the thermal damage area is very regular ,so it has smaller damage to deep tissue . Conclusion: The efficiency of laser heat head for tissue cutting was better. This study indicate that we might be able to make laser which the tissue have a low absorption coefficient about it to obtain good results for tissue cutting through the laser point heat source.

  18. Photodissociation of the Propargyl (C3D3) Radicals at 248 nm and 193 nm

    SciTech Connect

    Neumark., D.M.; Crider, P.E.; Castiglioni, L.; Kautzman, K.K.

    2009-01-21

    The photodissociation of perdeuterated propargyl (D{sub 2}CCCD) and propynyl (D{sub 3}CCC) radicals was investigated using fast beam photofragment translational spectroscopy. Radicals were produced from their respective anions by photodetachment at 540 nm and 450 nm (below and above the electron affinity of propynyl). The radicals were then photodissociated by 248 nm or 193 nm light. The recoiling photofragments were detected in coincidence with a time- and position-sensitive detector. Three channels were observed: D{sub 2} loss, CD + C{sub 2}D{sub 2}, and CD{sub 3} + C{sub 2}. Obervation of the D loss channel was incompatible with this experiment and was not attempted. Our translational energy distributions for D{sub 2} loss peaked at nonzero translational energy, consistent with ground state dissociation over small (< 1 eV) exit barriers with respect to separated products. Translational energy distributions for the two heavy channels peaked near zero kinetic energy, indicating dissociation on the ground state in the absence of exit barriers.

  19. Evaluation of the Diode laser (810nm,980nm) on dentin tubule diameter following internal bleaching

    PubMed Central

    Kiomarsi, Nazanin; Salim, Soheil; Sarraf, Pegah; Javad-Kharazifard, Mohammad

    2016-01-01

    Background The aim of this study was to evaluate the effect of diode laser irradiation and bleaching materials on the dentinal tubule diameter after laser bleaching. Material and Methods The dentin discs of 40 extracted third molar were used in this experiment. Each disc surface was divided into two halves by grooving. Half of samples were laser bleached at different wavelengths with two different concentrations of hydrogen peroxide. Other half of each disc with no laser bleaching remained as a negative control. Dentin discs were assigned randomly into four groups (n=10) with following hydrogen peroxide and diode laser wavelength specifications; Group 1 (30% - 810 nm), group 2 (30% - 980 nm), group 3 (46% - 810 nm) and group 4 (46% - 980 nm). All specimens were sent for scanning electron microscopic (SEM) analysis in order to measure tubular diameter in laser treated and control halves. Data were analyzed by ANOVA and Tukey test (p<0.05). Results A significant reduction in dentin tubule diameter was observed in groups 1, 2 and 4. There was no significant difference between groups 1 and 2 and between groups 3 and 4 after bleaching. Conclusions The SEM results showed that diode laser was able to reduce dentin tubule diameter and its effect on dentin was dependent on chemical action of bleaching material. Key words:Laser, diode, dentin, tubule, diameter. PMID:27398172

  20. Characterization of LANDSAT Panels Using the NIST BRDF Scale from 1100 nm to 2500 nm

    NASA Technical Reports Server (NTRS)

    Markham, Brian; Tsai, Benjamin K.; Allen, David W.; Cooksey, Catherine; Yoon, Howard; Hanssen, Leonard; Zeng, Jinan; Fulton, Linda; Biggar, Stuart; Markham, Brian

    2010-01-01

    Many earth observing sensors depend on white diffuse reflectance standards to derive scales of radiance traceable to the St Despite the large number of Earth observing sensors that operate in the reflective solar region of the spectrum, there has been no direct method to provide NIST traceable BRDF measurements out to 2500 rim. Recent developments in detector technology have allowed the NIST reflectance measurement facility to expand the operating range to cover the 250 nm to 2500 nm range. The facility has been modified with and additional detector using a cooled extended range indium gallium arsenide (Extended InGaAs) detector. Measurements were made for two PTFE white diffuse reflectance standards over the 1100 nm to 2500 nm region at a 0' incident and 45' observation angle. These two panels will be used to support the OLI calibration activities. An independent means of verification was established using a NIST radiance transfer facility based on spectral irradiance, radiance standards and a diffuse reflectance plaque. An analysis on the results and associated uncertainties will be discussed.

  1. THE SPECTRUM OF THORIUM FROM 250 nm TO 5500 nm: RITZ WAVELENGTHS AND OPTIMIZED ENERGY LEVELS

    SciTech Connect

    Redman, Stephen L.; Nave, Gillian; Sansonetti, Craig J.

    2014-03-01

    We have made precise observations of a thorium-argon hollow cathode lamp emission spectrum in the region between 350 nm and 1175 nm using a high-resolution Fourier transform spectrometer. Our measurements are combined with results from seven previously published thorium line lists to re-optimize the energy levels of neutral, singly, and doubly ionized thorium (Th I, Th II, and Th III). Using the optimized level values, we calculate accurate Ritz wavelengths for 19, 874 thorium lines between 250 nm and 5500 nm (40, 000 cm{sup –1} to 1800 cm{sup –1}). We have also found 102 new thorium energy levels. A systematic analysis of previous measurements in light of our new results allows us to identify and propose corrections for systematic errors in Palmer and Engleman and typographical errors and incorrect classifications in Kerber et al. We also found a large scatter with respect to the thorium line list of Lovis and Pepe. We anticipate that our Ritz wavelengths will lead to improved measurement accuracy for current and future spectrographs that make use of thorium-argon or thorium-neon lamps as calibration standards.

  2. Faster qualification of 193-nm resists for 100-nm development using photo cell monitoring

    NASA Astrophysics Data System (ADS)

    Jones, Chris M.; Kallingal, Chidam; Zawadzki, Mary T.; Jeewakhan, Nazneen N.; Kaviani, Nazila N.; Krishnan, Prakash; Klaum, Arthur D.; Van Ess, Joel

    2003-05-01

    The development of 100-nm design rule technologies is currently taking place in many R&D facilities across the world. For some critical alyers, the transition to 193-nm resist technology has been required to meet this leading edge design rule. As with previous technology node transitions, the materials and processes available are undergoing changes and improvements as vendors encounter and solve problems. The initial implementation of the 193-nm resits process did not meet the photolithography requirements of some IC manufacturers due to very high Post Exposure Bake temperature sensitivity and consequently high wafer to wafer CD variation. The photoresist vendors have been working to improve the performance of the 193-nm resists to meet their customer's requirements. Characterization of these new resists needs to be carried out prior to implementation in the R&D line. Initial results on the second-generation resists evaluated at Cypress Semicondcutor showed better CD control compared to the aelrier resist with comparable Depth of Focus (DOF), Exposure Latitute, Etch Resistance, etc. In addition to the standard lithography parameters, resist characterization needs to include defect density studies. It was found that the new resists process with the best CD control, resulted in the introduction of orders of magnitude higher yield limiting defects at Gate, Contact adn Local Interconnect. The defect data were shared with the resists vendor and within days of the discovery the resist vendor was able to pinpoint the source of the problem. The fix was confirmed and the new resists were successfully released to production. By including defect monitoring into the resist qualification process, Cypress Semiconductor was able to 1) drive correction actions earlier resulting in faster ramp and 2) eliminate potential yield loss. We will discuss in this paper how to apply the Micro Photo Cell Monitoring methodology for defect monitoring in the photolithogprhay module and the

  3. Spectroscopy of Pluto, 380-930 Nm at Six Longitudes

    NASA Technical Reports Server (NTRS)

    Cruikshank, D. P.; Pinilla-Alonso, N.; Lorenzi, V.; Grundy, William; Licandro, J.; Binzel, R. P.

    2014-01-01

    We have obtained spectra of the Pluto-Charon pair (unresolved) in the wavelength range 380-930 nm with resolution approx..450 at six roughly equally spaced longitudes. The data were taken in May and June, 2014, with the 4.2-m Isaac Newton Telescope at Roque de Los Muchachos Observatory in the Canary Islands, using the ACAM (auxiliary-port camera) in spectrometer mode, and using two solar analog stars. The new spectra clearly show absorption bands of solid CH4 at 620, 728, and 850-910 nm, which were known from earlier work. The 620-nm CH4 band is intrinsically very weak, and its appearance indicates a long optical path-length through the ice. This is especially true if it arises from CH4 dissolved in N2 ice. Earlier work (Owen et al. Science 261, 745, 1993) on the near-infrared spectrum of Pluto (1-2.5 microns) has shown that the CH4 bands are shifted to shorter wavelengths because the CH4 occurs as a solute in beta-phase crystalline N2. The optical path-length through the N2 crystals must be on the order of several cm to produce the N2 band observed at 2.15 microns. The new spectra exhibit a pronounced red slope across the entire wavelength range; the slope is variable with longitude, and differs in a small but significant way from that measured at comparable longitudes by Grundy & Fink (Icarus 124, 329, 1996) in their 15-year study of Pluto's spectrum (500-1000 nm). The new spectra will provide an independent means for calibrating the color filter bands on the Multispectral Visible Imaging Camera (MVIC) (Reuter et al. Space Sci. Rev. 140, 129, 2008) on the New Horizons spacecraft, which will encounter the Pluto-Charon system in mid-2015. They will also form the basis of modeling the spectrum of Pluto at different longitudes to help establish the nature of the non-ice component(s) of Pluto's surface. It is presumed that the non-ice component is the source of the yellow-red coloration of Pluto, which is known to be variable across the surface.

  4. Spectroscopy of Pluto at six longitudes, 380-930 nm

    NASA Astrophysics Data System (ADS)

    Cruikshank, Dale P.; Pinilla-Alonso, Noemi; Lorenzi, Vania; Grundy, Will M.; Licandro, Javier; Binzel, Richard P.

    2014-11-01

    We have obtained spectra of the Pluto-Charon pair (unresolved) in the wavelength range 380-930 nm with resolution ~450 at six roughly equally spaced longitudes. The data were taken in May and June, 2014, with the 4.2-m Isaac Newton Telescope at Roque de Los Muchachos Observatory in the Canary Islands, using the ACAM (auxiliary-port camera) in spectrometer mode, and using two solar analog stars. The new spectra clearly show absorption bands of solid CH4 at 620, 728, and 850-910 nm, which were known from earlier work. The 620-nm CH4 band is intrinsically very weak, and its appearance indicates a long optical pathlength through the ice. This is especially true if it arises from CH4 dissolved in N2 ice. Earlier work (Owen et al. Science 261, 745, 1993) on the near-infrared spectrum of Pluto (1-2.5 µm) has shown that the CH4 bands are shifted to shorter wavelengths because the CH4 occurs as a solute in beta-phase crystalline N2. The optical pathlength through the N2 crystals must be on the order of several cm to produce the N2 band observed at 2.15 µm. The new spectra exhibit a pronounced red slope across the entire wavelength range; the slope is variable with longitude, and differs in a small but significant way from that measured at comparable longitudes by Grundy & Fink (Icarus 124, 329, 1996) in their 15-year study of Pluto’s spectrum (500-1000 nm). The new spectra will provide an independent means for calibrating the color filter bands on the Multispectral Visible Imaging Camera (MVIC) (Reuter et al. Space Sci. Rev. 140, 129, 2008) on the New Horizons spacecraft, which will encounter the Pluto-Charon system in mid-2015. They will also form the basis of modeling the spectrum of Pluto at different longitudes to help establish the nature of the non-ice component(s) of Pluto’s surface. It is presumed that the non-ice component is the source of the yellow-red coloration of Pluto, which is known to be variable across the surface.

  5. Improved beam profile of a 266 nm deep ultraviolet laser employing a multi-mirror-reflected cavity

    NASA Astrophysics Data System (ADS)

    Yang, Houwen; Cheng, Wenyong; Wang, Junhua; Zhang, Yaguang; Wang, Xiaoqian; Zhang, Lijie

    2016-04-01

    A 266 nm deep ultraviolet (DUV) laser with a good Gaussian profile is reported employing a multi-mirror-reflected cavity. A type-I LiB3O5 (LBO) crystal is used to double the fundamental-light (1064 nm) wavelength generated by an actively Q-switched Nd:YVO4 laser with an intra-cavity configuration. A fourth harmonic generation (FHG) wavelength is obtained by a type-I β-BaB2O4 (BBO) crystal. The output power as high as 440 mW at 266 nm is generated under an incident power of 2.26 W at 532 nm, corresponding to the conversion efficiency of 532 nm-266 nm up to 19.5% with a repetition rate of 15 kHz and the pulse duration of 266 nm is 10.7 ns.

  6. Singly resonant sum-frequency generation of 520-nm laser via a variable input-coupling transmission cavity

    NASA Astrophysics Data System (ADS)

    Guo, Shanlong; Ge, Yulong; He, Jun; Wang, Junmin

    2015-11-01

    We experimentally present a three-mirror folded singly resonant sum-frequency generation (SFG) cavity with an adjustable input coupling, which has been applied to 520-nm single-frequency laser generation via 780-nm laser and 1560-nm laser frequency mixing in a periodically poled KTiOPO4 crystal (PPKTP). A continuous variation in the input coupling reflectivity from 81.4 to 96.1% for 780-nm resonant laser is achieved by tilting the input coupler, and the impedance matching of the resonator can be optimized. Up to 268 mW of SFG output power at 520-nm is obtained with 6.8 W of the 1560-nm laser input and 1.5 W of 780-nm laser input.

  7. Achieving 50 nm lateral-resolution quantitative EDX SEM

    NASA Astrophysics Data System (ADS)

    Pimentel, G.; Lozano-Perez, S.

    2015-10-01

    Low Voltage Scanning Electron Microscopy (LV-SEM) has become a very promising approach to perform Energy Dispersive X-ray (EDX) chemical mapping with high- lateral resolution [1]. Using voltages as low as 1.5keV, sub-10nm resolutions can be achieved. In this work, we try to take advantage of the small interaction volume in order to simplify the otherwise more complex SEM quantitative methodology. This way, phenomena such as absorption and fluorescence can be ignored and, effectively treat the quantification as with the Transmission Electron Microscopy (TEM)-based Cliff-Lorimer method. Experimental k- factors have been obtained from a series of standards and used to quantify complex oxide phases in steels.

  8. Characterization of a THz CW spectrometer pumped at 1550 nm

    NASA Astrophysics Data System (ADS)

    Yeo, Woon-Gi; Nahar, Niru K.

    2015-07-01

    We present an evaluation of a cost-effective THz CW spectrometer pumped at 1550 nm wavelengths with a fixed delay line. To study the spectral competence of the spectrometer, transmission data is obtained for various organic and inorganic samples. Spectral comparisons of the samples are presented by using THz time domain spectroscopy and vector network analyzer (VNA). Despite the capability of highly resolved transmission spectroscopy, our current system reveals the uncertainty in interferometric output data for phase analysis. Here, we identify the effect of fringing space of raw output data toward frequency resolution, phase analysis, and data acquisition time. We also propose the proper delay line setup for phase analysis for this type of spectrometers.

  9. Classification of LSQ Supernova LSQ13vy with FLOYDS at Faulkes Telescope South

    NASA Astrophysics Data System (ADS)

    Valenti, S.; Graham, M. L.; Howell, D. A.; Sand, D.; Parrent, J. T.; Hadjiyska, E.; Walker, E. S.; Rabinowitz, D.; Baltay, C.; Ellman, N.; McKinnon, R.; Feindt, U.; Nugent, P.

    2013-04-01

    We report a spectroscopic classification of LSQ13vy located at ra= 16:06:55.85 dec=+03:00:15.1. A spectrum (range 350-1000 nm) obtained robotically on Apr. 06.70 UT with the FLOYDS spectrograph at "Faulkes Telescope South" at Siding Spring, shows it to be a SN type Ia several days before maxium at a redshift of 0.032. Comparisons with a library of supernova spectra using the Superfit SN spectral identification code (Howell et al.

  10. Emission spectroscopy analysis during Nopal cladodes dethorning by laser ablation

    NASA Astrophysics Data System (ADS)

    Peña-Díaz, M.; Ponce, L.; Arronte, M.; Flores, T.

    2007-04-01

    Optical emission spectroscopy of the pulsed laser ablation of spines and glochids from Opuntia (Nopal) cladodes was performed. Nopal cladodes were irradiated with Nd:YAG free-running laser pulses on their body, glochids and spines. Emission spectroscopy analyses in the 350-1000 nm region of the laser induced plasma were made. Plasma plume evolution characterization, theoretical calculations of plasma plume temperature and experiments varying the processing atmosphere showed that the process is dominated by a thermally activated combustion reaction which increases the dethorning process efficiency. Therefore, appropriate laser pulse energy for minimal damage of cladodes body and in the area beneath glochids and spines can be obtained.

  11. Dosimetric analysis for low-level laser therapy (LLLT) of the human inner ear at 593 nm and 633 nm

    NASA Astrophysics Data System (ADS)

    Beyer, Wolfgang; Baumgartner, Reinhold; Tauber, Stefan

    1998-12-01

    The administration of low-level-laserlight for irradiation of the inner ear could represented a new therapeutic model for complex diseases of the inner ear. However, successful therapy requires a well-defined light dosimetry based on a dosimetric analysis of the human cochlea that represents a complex anatomy. The light distribution inside the cochlear windings, produced by an irradiation of the tympanic membrane, was quantitatively measured ex vivo for HeNe laser wavelengths of 593 nm and 633 nm. To obtain the space irradiance within an intact cochlea a correction factor of about 6 has been determined by Monte Carlo calculations. It follows from 3 contributions, first the backscattering of light in the bony parts removed during the preparation procedure of the specimen, second the change of index of refraction from the bony parts to air and third some geometrical factors due to the angular distribution of the radiation. The transmission of light across the tympanic cavity and the promontory depends strongly on the wavelength. Due to the observed spatial intensity variations of a factor 10 and more inside the cochlear windings the optimum external light dose has to be chosen with regard to the tonotopy of the ear.

  12. Time-resolved spectroscopy of nucleic acid systems using synchrotron radiation from 230 nm to 354 nm

    NASA Astrophysics Data System (ADS)

    Daniels, Malcolm; Ballini, Jean-Pierre; Vigny, Paul

    1992-07-01

    The excited states of nucleic acids are complex, both at the individual chromophore level and because of the effect of stacking interactions on the electronic states. Considerable progress has been made recently by studying the lifetimes of the stacked states and by utilizing the technique of time-resolved spectroscopy. Experimental results obtained using the ACO synchrotron at LURE, Orsay, will be presented. Resolution of the decay data gives a model-based estimate of the number of emitting species and their lifetimes, and this information is then used to deconvolate experimental time-windowed spectra (time-delayed spectra) to give true time-resolved spectra. It is a unique feature of the synchrotron, compared with the laser, that the combination of delayed detection (photon counting) with the continuous wavelength distribution of the synchrotron allows the acquisition of excitation spectra by uninterrupted repetitive scanning over a wide range of UV exciting wavelengths, in the present work from 230 nm to 354 nm. Such time-delayed excitation spectra can also be deconvoluted into components corresponding to the various time-resolved emission spectra. In this way we are able to demonstrate for the first time that ground state stacking interactions are directly responsible for excimer-like emissions. Time-resolved emission spectra and time-resolved excitation spectra will be presented for the dinucleoside phosphate d(CG) and the synthetic alternating polynucleotide poly d(GC), a `B-type' DNA structure.

  13. High-power 880-nm diode-directly-pumped passively mode-locked Nd:YVO₄ laser at 1342 nm with a semiconductor saturable absorber mirror.

    PubMed

    Li, Fang-Qin; Liu, Ke; Han, Lin; Zong, Nan; Bo, Yong; Zhang, Jing-Yuan; Peng, Qin-Jun; Cui, Da-Fu; Xu, Zu-Yan

    2011-04-15

    A high-power 880-nm diode-directly-pumped passively mode-locked 1342 nm Nd:YVO₄ laser was demonstrated with a semiconductor saturable absorber mirror (SESAM). The laser mode radii in the laser crystal and on the SESAM were optimized carefully using the ABCD matrix formalism. An average output power of 2.3 W was obtained with a repetition rate of 76 MHz and a pulse width of 29.2 ps under an absorbed pump power of 12.1 W, corresponding to an optical-optical efficiency of 19.0% and a slope efficiency of 23.9%, respectively. PMID:21499398

  14. The ultraviolet photodissociation of Cl2O at 235 nm and of HOCl at 235 and 266 nm

    NASA Astrophysics Data System (ADS)

    Tanaka, Yoshiki; Kawasaki, Masahiro; Matsumi, Yutaka; Fujiwara, Hisashi; Ishiwata, Takashi; Rogers, Leon J.; Dixon, Richard N.; Ashfold, Michael N. R.

    1998-07-01

    The primary photochemistry of gas phase dichlorine monoxide (Cl2O) and of hypochlorous acid (HOCl) following excitation at 235 nm has been investigated using photofragment ion imaging to obtain the recoil velocity and angular distributions of the ground (2P3/2) and spin-orbit excited (2P1/2) atomic chlorine products. In the case of Cl2O, both Cl spin-orbit products exhibit angular distributions characterized by an anisotropy parameter, β=1.2±0.2, consistent with previous interpretations of the ultraviolet (UV) absorption spectrum of Cl2O which associate the broad intense absorption feature peaking at λ˜255 nm with excitation to a (bent) dissociative state of 1B2(C2v) symmetry. The recoil velocity distributions of the two Cl spin-orbit products are markedly different. The ground state atoms (which constitute >90% of the total Cl atom yield) are partnered by ClO fragments carrying significantly higher average levels of internal excitation. The slowest Cl atoms are most readily understood in terms of three body fragmentation of Cl2O to its constituent atoms. These findings are rationalized in terms of a model potential energy surface for the 1 1B2 state, which correlates diabatically with ClO(X) radicals together with a spin-orbit excited Cl atom, with efficient radiationless transfer to one (or more) lower energy surfaces at extended Cl-O bond lengths accounting for the dominance of ground state Cl atom fragments. The image of the ground state Cl atoms resulting from photolysis of HOCl at 235 nm is consistent with parent excitation via a transition for which the dipole moment is closely aligned with the Cl-O bond, followed by prompt dissociation (β=1.7±0.2) with the bulk of the excess energy partitioned into product recoil. Such conclusions are consistent with the results of laser induced fluorescence measurements of the OH(X) products resulting from 266 nm photodissociation of HOCl which reveal OH(X) products in both spin-orbit states, exclusively in their

  15. Multi-watt 589nm fiber laser source

    SciTech Connect

    DAWSON, J W; DROBSHOFF, A D; BEACH, R J; MESSERLY, M J; PAYNE, S A; BROWN, A; PENNINGTON, D M; BAMFORD, D J; SHARPE, S J; COOK, D J

    2006-01-19

    We have demonstrated 3.5W of 589nm light from a fiber laser using periodically poled stoichiometric Lithium Tantalate (PPSLT) as the frequency conversion crystal. The system employs 938nm and 1583nm fiber lasers, which were sum-frequency mixed in PPSLT to generate 589nm light. The 938nm fiber laser consists of a single frequency diode laser master oscillator (200mW), which was amplified in two stages to >15W using cladding pumped Nd{sup 3+} fiber amplifiers. The fiber amplifiers operate at 938nm and minimize amplified spontaneous emission at 1088nm by employing a specialty fiber design, which maximizes the core size relative to the cladding diameter. This design allows the 3-level laser system to operate at high inversion, thus making it competitive with the competing 1088nm 4-level laser transition. At 15W, the 938nm laser has an M{sup 2} of 1.1 and good polarization (correctable with a quarter and half wave plate to >15:1). The 1583nm fiber laser consists of a Koheras 1583nm fiber DFB laser that is pre-amplified to 100mW, phase modulated and then amplified to 14W in a commercial IPG fiber amplifier. As a part of our research efforts we are also investigating pulsed laser formats and power scaling of the 589nm system. We will discuss the fiber laser design and operation as well as our results in power scaling at 589nm.

  16. Fast dispersion encoded full range OCT for retinal imaging at 800 nm and 1060 nm

    NASA Astrophysics Data System (ADS)

    Hofer, Bernd; Považay, Boris; Unterhuber, Angelika; Wang, Ling; Hermann, Boris; Rey, Sara; Matz, Gerald; Drexler, Wolfgang

    2011-03-01

    The dispersion mismatch between sample and reference arm in frequency-domain OCT can be used to iteratively suppress complex conjugate artifacts and thereby increase the imaging range. We propose a fast dispersion encoded full range (DEFR) algorithm that detects multiple signal components per iteration. The influence of different dispersion levels on the reconstruction quality is analyzed for in vivo retinal tomograms at 800 nm. Best results have been achieved with about 30 mm SF11, with neglectable resolution decrease due to finite resolution of the spectrometer. Our fast DEFR algorithm achieves an average suppression ratio of 55 dB and converges within 5 to 10 iterations. The processing time on non-dedicated hardware was 5 to 10 seconds for tomograms with 512 depth scans and 4096 sampling points per depth scan. Application of DEFR to the more challenging 1060 nm wavelength region is demonstrated by introducing an additional optical fibre in the sample arm.

  17. Isothermal annealing of a 620 nm optical absorption band in Brazilian topaz crystals

    NASA Astrophysics Data System (ADS)

    Isotani, Sadao; Matsuoka, Masao; Albuquerque, Antonio Roberto Pereira Leite

    2013-04-01

    Isothermal decay behaviors, observed at 515, 523, 562, and 693 K, for an optical absorption band at 620 nm in gamma-irradiated Brazilian blue topaz were analyzed using a kinetic model consisting of O- bound small polarons adjacent to recombination centers (electron traps). The kinetic equations obtained on the basis of this model were solved using the method of Runge-Kutta and the fit parameters describing these defects were determined with a grid optimization method. Two activation energies of 0.52±0.08 and 0.88±0.13 eV, corresponding to two different structural configurations of the O- polarons, explained well the isothermal decay curves using first-order kinetics expected from the kinetic model. On the other hand, thermoluminescence (TL) emission spectra measured at various temperatures showed a single band at 400 nm in the temperature range of 373-553 K in which the 620 nm optical absorption band decreased in intensity. Monochromatic TL glow curve data at 400 nm extracted from the TL emission spectra observed were found to be explained reasonably by using the knowledge obtained from the isothermal decay analysis. This suggests that two different structural configurations of O- polarons are responsible for the 620 nm optical absorption band and that the thermal annealing of the polarons causes the 400 nm TL emission band.

  18. TUNABLE DIODE LASER MEASUREMENTS OF NO2 NEAR 670 NM AND 395 NM. (R823933)

    EPA Science Inventory

    Two single-mode diode lasers were used to record high-resolution absorption spectra of NO2 (dilute in Ar) near 670.2 and 394.5 nm over a range of temperatures (296 to 774 K) and total pressures (2.4 x 10(-2) to 1 atm). A commercial InGaAsP laser was tuned 1.3 cm(-1) at a repetiti...

  19. Analysis of multi-mode to single-mode conversion at 635 nm and 1550 nm

    NASA Astrophysics Data System (ADS)

    Zamora, Vanessa; Bogatzki, Angelina; Arndt-Staufenbiel, Norbert; Hofmann, Jens; Schröder, Henning

    2016-03-01

    We propose two low-cost and robust optical fiber systems based on the photonic lantern (PL) technology for operating at 635 nm and 1550 nm. The PL is an emerging technology that couples light from a multi-mode (MM) fiber to several single-mode (SM) fibers via a low-loss adiabatic transition. This bundle of SM fibers is observed as a MM fiber system whose spatial modes are the degenerate supermodes of the bundle. The adiabatic transition allows that those supermodes evolve into the modes of the MM fiber. Simulations of the MM fiber end structure and its taper transition have been performed via functional mode solver tools in order to understand the modal evolution in PLs. The modelled design consists of 7 SM fibers inserted into a low-index capillary. The material and geometry of the PLs are chosen such that the supermodes match to the spatial modes of the desired step-index MM fiber in a moderate loss transmission. The dispersion of materials is also considered. These parameters are studied in two PL systems in order to reach a spectral transmission from 450 nm to 1600 nm. Additionally, an analysis of the geometry and losses due to the mismatching of modes is presented. PLs are typically used in the fields of astrophotonics and space photonics. Recently, they are demonstrated as mode converters in telecommunications, especially focusing on spatial division multiplexing. In this study, we show the use of PLs as a promising interconnecting tool for the development of miniaturized spectrometers operating in a broad wavelength range.

  20. Laser Direct Writing of Long Period Fiber Grating by 800 NM Femtosecond Laser Pulses

    NASA Astrophysics Data System (ADS)

    Ruan, Shuangchen; Huang, Yi; Du, Chenlin; Yu, Yongqin

    Femtosecond laser pulses with ultrashort time duration and ultrahigh peak power can cause the refractive index change in transparent materials and micron scale machining precision. Long period fiber gratings (LPFGs) with different periods and different grating lengths in the standard single mode fiber were fabricated, using laser direct writing method, by femtosecond laser pulses with pulse width of 200 fs at a center wavelength of 800 nm in air. The transmission spectra were studied in the range of 1510 nm to 1610 nm. Two LPFGs with period of 400 μm, and 550 μm, respectively fabricated with same irradiation power of 275 mW, were shown. The loss peak of 1552 nm, the transmission loss of 16 dB and the FWHM of 20 nm were obtained when the period of LPFG was 400 μm, while the loss peak of 1588 nm, the transmission loss of 20 dB and the FWHM of 25 nm were achieved when the period of LPFG was 550 μm. According to the theory of mode field coupling for long period grating, it was indicated that the modulation of refractive index Δn was in the level of 10-2.

  1. New polymer for 157-nm single-layer resist based on fluorine-containing acryl copolymer

    NASA Astrophysics Data System (ADS)

    Ogata, Toshiyuki; Endo, Koutaro; Komano, Hiroshi; Nakayama, Toshimasa

    2001-08-01

    We are reporting on the development of acryl polymer based on novel methacrylate and acrylate monomers with various trifluoromethyl groups for the application to 157nm chemically amplified positive-tone resists. The (alpha) - trifluoromethylation of the alkyl ester in methacrylate or acrylate could employ the reduction of acrylpolymer absorbance at 157nm by spectra analysis with the VUV-200 spectrophotometer by JASCO. Although the trifluoromethyl groups could employ the reduction of base polymer absorbance at 157nm, the homopolymers have issued weak etch resistance as a photoresist base polymer. To take account of this issue, we have developed a novel monomer, trifluoromethyl- iso-adamantylmethacrylate (TFIAdMA) and a new co-polymer system with the combination of fluorinated methacrylate derivatives and substituted p-hydroxystyrene. The absorption coefficient of poly(p-tert-butoxystyren-co- hexafluoro-tert-butyl methacrylate-co-methacrylic acid) incicated to be less than 3 micrometers -1 at 157nm. Patterning results were obtained with a 157nm contact exposure system of VUVES-4500 by LTJ. One of the experimental resists, based on a particular polymer ratio and photo acid generator, has clearly achieved 180nm line and space pattern resolution. At 140nm resist film thickness, the sensitivity was 31 mJ/cm2 when using 0,26N tetrametylammonium hydroxide surfactant type developer.

  2. Electron-induced single event upsets in 28 nm and 45 nm bulk SRAMs

    DOE PAGESBeta

    Trippe, J. M.; Reed, R. A.; Austin, R. A.; Sierawski, B. D.; Weller, R. A.; Funkhouser, E. D.; King, M. P.; Narasimham, B.; Bartz, B.; Baumann, R.; et al

    2015-12-01

    In this study, we present experimental evidence of single electron-induced upsets in commercial 28 nm and 45 nm CMOS SRAMs from a monoenergetic electron beam. Upsets were observed in both technology nodes when the SRAM was operated in a low power state. The experimental cross section depends strongly on both bias and technology node feature size, consistent with previous work in which SRAMs were irradiated with low energy muons and protons. Accompanying simulations demonstrate that δ-rays produced by the primary electrons are responsible for the observed upsets. Additional simulations predict the on-orbit event rates for various Earth and Jovian environmentsmore » for a set of sensitive volumes representative of current technology nodes. The electron contribution to the total upset rate for Earth environments is significant for critical charges as high as 0.2 fC. This value is comparable to that of sub-22 nm bulk SRAMs. Similarly, for the Jovian environment, the electron-induced upset rate is larger than the proton-induced upset rate for critical charges as high as 0.3 fC.« less

  3. Electron-induced single event upsets in 28 nm and 45 nm bulk SRAMs

    SciTech Connect

    Trippe, J. M.; Reed, R. A.; Austin, R. A.; Sierawski, B. D.; Weller, R. A.; Funkhouser, E. D.; King, M. P.; Narasimham, B.; Bartz, B.; Baumann, R.; Schrimpf, R. D.; Labello, R.; Nichols, J.; Weeden-Wright, S. L.

    2015-12-01

    In this study, we present experimental evidence of single electron-induced upsets in commercial 28 nm and 45 nm CMOS SRAMs from a monoenergetic electron beam. Upsets were observed in both technology nodes when the SRAM was operated in a low power state. The experimental cross section depends strongly on both bias and technology node feature size, consistent with previous work in which SRAMs were irradiated with low energy muons and protons. Accompanying simulations demonstrate that δ-rays produced by the primary electrons are responsible for the observed upsets. Additional simulations predict the on-orbit event rates for various Earth and Jovian environments for a set of sensitive volumes representative of current technology nodes. The electron contribution to the total upset rate for Earth environments is significant for critical charges as high as 0.2 fC. This value is comparable to that of sub-22 nm bulk SRAMs. Similarly, for the Jovian environment, the electron-induced upset rate is larger than the proton-induced upset rate for critical charges as high as 0.3 fC.

  4. Demonstration of a high output power 1533nm optical parametric oscillator pumped at 1064nm

    NASA Astrophysics Data System (ADS)

    Foltynowicz, Robert J.; Wojcik, Michael D.

    2010-10-01

    A high output power, eye-safe, LIDAR transmitter based on a KTA optical parametric oscillator (OPO) was demonstrated. The OPO was based on a two crystal, NCPM, KTA ring cavity which was doubly resonant. A 7ns, 30Hz, flashlamp-pumped, Q-switched Nd:YAG laser was injection seeded and used to pump the OPO. The OPO converted the 1064 nm pump beam into a 1533 nm signal wave and 3475 nm idler wave. In addition to demonstrating a high power OPO system, we investigated the effects of seeding the pump laser on the OPO's conversion efficiency, oscillation threshold, maximum signal power, and beam quality. The power conversion efficiency between the signal and the injection seeded pump was 22% with an oscillation threshold of 104 MW/cm2 (500 mJ) and a maximum signal power of 6.44 W (215 mJ). The power conversion efficiency between the signal and the unseeded pump was 24% with an oscillation threshold of 77 MW/cm2 (367mJ) and a maximum signal power of 7 W (233 mJ). The beam quality of the signal beam was produced an M2 =15. When the pump laser was seeded, the full angle divergence improved by nearly a factor of five.

  5. 264 W output power at 1585 nm in Er-Yb codoped fiber laser using in-band pumping.

    PubMed

    Jebali, M A; Maran, J-N; LaRochelle, S

    2014-07-01

    We demonstrate a high-power cladding-pumped Er-Yb codoped fiber laser with 74% efficiency. A pump-limited output power of 264 W is obtained using in-band pumping at 1535 nm. We compare the efficiency of 1480 and 1535 nm pumping through numerical simulations and experimental measurements. PMID:24978785

  6. Fabrication of sub-12 nm thick silicon nanowires by processing scanning probe lithography masks

    SciTech Connect

    Kyoung Ryu, Yu; Garcia, Ricardo; Aitor Postigo, Pablo; Garcia, Fernando

    2014-06-02

    Silicon nanowires are key elements to fabricate very sensitive mechanical and electronic devices. We provide a method to fabricate sub-12 nm silicon nanowires in thickness by combining oxidation scanning probe lithography and anisotropic dry etching. Extremely thin oxide masks (0.3–1.1 nm) are transferred into nanowires of 2–12 nm in thickness. The width ratio between the mask and the silicon nanowire is close to one which implies that the nanowire width is controlled by the feature size of the nanolithography. This method enables the fabrication of very small single silicon nanowires with cross-sections below 100 nm{sup 2}. Those values are the smallest obtained with a top-down lithography method.

  7. High-power 1018 nm ytterbium-doped fiber laser and its application in tandem pump.

    PubMed

    Xiao, Hu; Leng, Jinyong; Zhang, Hanwei; Huang, Liangjin; Xu, Jiangming; Zhou, Pu

    2015-09-20

    In this paper, we present our experimental results of a high-power 1018 nm fiber laser and its usage in tandem pump. A record output power of 476 W 1018 nm fiber laser is obtained with an efficiency of 78.2%. Utilizing a specially designed gain fiber, a one-stage high-power monolithic fiber amplifier tandem pumped by six 1018 nm fiber lasers is assembled. A 110 W 1090 nm seed is amplified to 2140 W, and the efficiency is as high as 86.9%. The beam quality factor M2 is measured to be 1.9. Limitations and possible solutions for purchasing higher output power are discussed. PMID:26406520

  8. Room-temperature, continuous-wave, 946-nm Nd:YAG laser pumped by laser-diode arrays and intracavity frequency doubling to 473 nm

    SciTech Connect

    Risk, W.P.; Lenth, W.

    1987-12-01

    We report the use of GaAlAs laser-diode arrays to pump a cw Nd:YAG laser operating on the 946-nm /sup 4/F/sub 3/2/..-->../sup 4/I/sub 9/2/ transition. At room temperature, the lasing threshold was reached with 58 mW of absorbed pump power, and, with 175 mW of absorbed pump power, 42 mW of output power at 946 nm was obtained in a TEM/sub 00/ mode by using 0.7% output coupling. In addition, pumping with an infrared dye laser operating in a pure TEM/sub 00/ mode was used to investigate the effects of reabsorption loss that are characteristic of the 946-nm laser transition. LiIO/sub 3/ was used as an intracavity doubling crystal, and 100 ..mu..W of blue light was generated by using diode-laser pumping in a nonoptimized cavity.

  9. Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography

    NASA Astrophysics Data System (ADS)

    Petersen, John S.; Socha, Robert J.; Naderi, Alex R.; Baker, Catherine A.; Rizvi, Syed A.; Van Den Broeke, Douglas J.; Kachwala, Nishrin; Chen, J. Fung; Laidig, Thomas L.; Wampler, Kurt E.; Caldwell, Roger F.; Takeuchi, Susumu; Yamada, Yoshiro; Senoh, Takashi; McCallum, Martin

    1998-09-01

    One method for making the alternating phase-shift mask involves cutting a trench into the quartz of the mask using an anisotropic dry etch, followed by an isotropic etch to move the corners of the trench underneath the chrome to minimize problems caused by diffraction at the bottom corners of the phase-trench. This manufacturing method makes the addition of subresolution scattering bars and serifs problematic, because the amount of the undercut causes chrome lifting of these small features. Adding an additional anisotropically etched trench to both cut and uncut regions is helpful, but the etch does not move the trench corners under the chrome and result in a loss to intensity and image contrast. At 248 nm illumination and 4X magnification, our work shows that a combination of 240 nm dual-trench and 5 nm to 10 nm undercut produces images with equal intensity between shifted and unshifted regions without loss of image contrasts. This paper demonstrates optical proximity correction for doing 100 nm, 120 nm, 140 nm and 180 nm lines of varying pitch for a simple alternating phase-shift mask, with no dual-trench or undercut. Then the electromagnetic field simulator, TEMPEST, is used to find the best combination of dual-trench depth and amount of undercut for an alternating phase-shift mask. Phase measurement using 248 nm light and depth measurement of thirty-six unique combinations of dual-trench and phase-shift trench are shown. Based on modeling and experimental results, recommendations for making a fine tuned dual-trench 248 nm mask, as well as an extension of the dual-trench alternating phase-shift technique to 193 nm lithography, are made.

  10. Highly efficient intracavity frequency-doubled Nd:GdVO4-LBO red laser at 670 nm under direct 880 nm pumping

    NASA Astrophysics Data System (ADS)

    Lü, Y. F.; Zhang, X. H.; Xia, J.; Yin, X. D.; Zhang, A. F.; Bao, L.; Wang, D.; Quan, H.

    2009-12-01

    We report the efficient compact red laser at 670 nm generation by intracavity frequency doubling of a continuous wave laser operation of a diode direct pumped Nd:GdVO4 laser on the 4 F 3/2 → 4 I 13/2 transition at 1340 nm. An LBO crystal, cut for critical type I phase matching at room temperature is used for second harmonic generation of the laser. At an absorbed pump power of 16.2 W, as high as 5.1 W of continuous wave output power at 670 nm is achieved with 15-mm-long LBO. The optical-to-optical conversion efficiency is up to 0.31, and the fluctuation of the red output power was better than 3.0% in the given 30 min. Comparative results obtained for the pump with diode laser at 808 nm, into the highly-absorbing 4 F 5/2 level, are given in order to prove the advantages of the 880 nm wavelength pumping.

  11. 1300 nm and 890 nm OCT images of oral cancer tissue engineered models and biopsy samples offer complimentary performance (Conference Presentation)

    NASA Astrophysics Data System (ADS)

    Boadi, Joseph; Byers, Robert A.; Fernandes, Jon; Mittar, Shweta; Hearnden, Vanessa; Lu, Zenghai; MacNeil, Sheila; Thornhill, Martin; Murdoch, Craig; Hunter, Keith D.; McKechnie, Alasdair; Matcher, Stephen J.

    2016-02-01

    OCT has demonstrated great potential to non-invasively detect oral epithelial cancers, potentially guiding biopsy and surgical resection. On non-ophthalmic tissues the preferred illumination wavelength is 1300 nm. Previous studies on skin have shown that useful image data can also be obtained at shorter wavelengths, with systems at 1060 nm and 820 nm offering reduced depth penetration but higher contrast. Here we apply a similar comparison to tissue engineered models of oral cancer and also to human biopsy samples, generally finding a similar trend. 1300 nm multi-beam OCT (Michelson Diagnostics EX1301) visualises stromal structures and surface keratin more clearly, providing useful image contrast down to around 1 mm. This system was compared with an ultra-high resolution home-built system operating at 890 nm (2.5 micron resolution vs 7.5 micron axial resolution for the EX1301). The UHR system reveals epithelial features more clearly, especially in the DOK pre-invasive cell line model and the biopsy samples. The relative effects of center wavelength vs axial resolution in generating the differential, wavelength-dependent contrast are assessed and the OCT biopsy images are compared with contemporary histology.

  12. Tunable high-power narrow-spectrum external-cavity diode laser based on tapered amplifier at 668 nm.

    PubMed

    Chi, Mingjun; Erbert, G; Sumpf, B; Petersen, Paul Michael

    2010-05-15

    A 668 nm tunable high-power narrow-spectrum diode laser system based on a tapered semiconductor optical amplifier in external cavity is demonstrated. The laser system is tunable from 659to675 nm. As high as 1.38 W output power is obtained at 668.35 nm. The emission spectral bandwidth is less than 0.07 nm throughout the tuning range, and the beam quality factor M(2) is 2.0 with the output power of 1.27 W. PMID:20479803

  13. ARSENIC REMOVAL FROM DRINKING WATER BY ADSORPTIVE MEDIA - USEPA DEMONSTRATION PROJECT AT DESERT SANDS MDWCA, NM SIX MONTH EVALUATION

    EPA Science Inventory

    This report documents the activities performed during, and the results obtained from, the first six months of the arsenic removal treatment technology demonstration project at the Desert Sands Mutual Domestic Water Consumers Association (MDWCA) facility in Anthony, NM. The object...

  14. Investigations on hydroxyapatite powder obtained by wet precipitation

    NASA Astrophysics Data System (ADS)

    Poinescu, Aurora Anca; Ion, Rodica Mariana; van Staden, Raluca-Ioana; van Staden, Jacobus Frederick; Ghiurea, Marius

    2010-11-01

    It is well-known that hydroxyapatite have multiple applications in tissue engineering due to compositional similarities with bone tissue. In this work, hydroxyapatite powders obtained by modified chemical precipitation route, has been investigated by AMF and SEM analysis grain size, X-ray diffraction and infra-red spectroscopy. The particle size of hydroxyapatite was observed to be very fine, uniform, around 50 -60 nm. SEM observation of the HA coatings showed the presence of nano-sized needles, with a significant level of agglomeration. The infrared analysis show the characteristic peaks of absorbed water, hydroxyl, phosphate and carbonate species. The XRD pattern clearly indicated the crystallites responsible for the Bragg reflection of the (002) and (003) planes are useful for size determination by Sherrer relationship (around 68 nm).

  15. Lasing at 300 nm and below: Optical challenges and perspectives

    SciTech Connect

    Garzella, D.; Couprie, M.E. |; Billardon, M.

    1995-12-31

    The FEL experiment in the visible and near UV on the Super ACO storage ring has given, since 1989, important informations on the SRFEL dynamics and, furthermore, a very good beam stability has been achieved. In addition, the operation at 350 nm with this good stability and a long beam lifetime allowed us to perform the first user experiment in biology and to start with a campaign for using the laser as photons source for experiments in other domains, coupling FEL light and the Synchrotron Radiation. For this, FEL starts to be very competitive with respect to the other conventional laser sources, provided that it could oscillate further in the UV, say at 300 nm and below. So, the real challenge is now given by the lasing at shorter wavelengths and, for this, by the optical technology existing nowadays. Since 1992 the efforts have been concentrating to look for every kind of solution allowing us to overcome the problem of having a very low gain. From an optical point of view, in the range of wavelengths explored, there is a lack of transparents dielectric materials for substrates and coatings. Substrates are required at the same time to be relatively not absorbing (a few tens 10{sup -6}), to have a very good surface quality (RMS roughness below 10 {Angstrom}) because of scattering losses dramatically increasing in this spectral range and, due to the thermal load of the undulator emission, to have adequate thermal characteristics. In order to fulfill all these requirements, a good characterisation and modelisation of the substrates is needed, especially to correlate thermal loading and mechanical deformations from one hand, and roughness and scattering losses from the other hand. Coatings must be not absorbing too and, above all, the most amorphous as possible (this could be obtained with IBS deposition technique), in order to insure a good reproduction of the substrate roughness at the interfaces and on the top layer and an higher resistance to the XUV photons load.

  16. First principles study on the interfacial properties of NM/graphdiyne (NM = Pd, Pt, Rh and Ir): The implications for NM growing

    NASA Astrophysics Data System (ADS)

    Lu, Zhansheng; Li, Shuo; Lv, Peng; He, Chaozheng; Ma, Dongwei; Yang, Zongxian

    2016-01-01

    Based on the dispersion-corrected density functional calculations (DFT-D), we systematically studied the adsorption of noble metals (NM), Pd, Pt, Rh and Ir, on graphdiyne (GDY). We present a systematic study on the geometry, embedded adsorption energy and electronic structure of four different adatoms adsorbed on the GDY. The strong interaction between the NM adatoms and the GDY substrate is found with the NM embedded in the 18C-hexagon of the GDY. We investigated the mobility of the NM adatoms on the GDY, and found that the mobility barrier energy increases along with the increasing of the embedded adsorption energy. We present the NM adatoms growth of high concentrations on the GDY. Upon the analysis of the electronic structure and the frontier molecular orbitals, Rh and Ir adatoms of low concentrations (about 1.37 at%) on the GDY have the potential to be applied as single metal catalysts or gas molecule sensors.

  17. Picosecond laser texturization of mc-silicon for photovoltaics: A comparison between 1064 nm, 532 nm and 355 nm radiation wavelengths

    NASA Astrophysics Data System (ADS)

    Binetti, Simona; Le Donne, Alessia; Rolfi, Andrea; Jäggi, Beat; Neuenschwander, Beat; Busto, Chiara; Frigeri, Cesare; Scorticati, Davide; Longoni, Luca; Pellegrino, Sergio

    2016-05-01

    Self-organized surface structures were produced by picosecond laser pulses on multi-crystalline silicon for photovoltaic applications. Three different laser wavelengths were employed (i.e. 1064 nm, 532 nm and 355 nm) and the resulting morphologies were observed to effectively reduce the reflectivity of the samples after laser irradiation. Besides, a comparative study of the laser induced subsurface damage generated by the three different wavelengths was performed by confocal micro-Raman, photoluminescence and transmission electron microscopy. The results of both the structural and optical characterization showed that the mc-Si texturing performed with the laser at 355 nm provides surface reflectivity between 11% and 8% over the spectral range from 400 nm to 1 μm, while inducing the lowest subsurface damage, located above the depletion region of the p-n junction.

  18. Tracking the photodissociation dynamics of liquid nitromethane at 266 nm by femtosecond time-resolved broadband transient grating spectroscopy

    NASA Astrophysics Data System (ADS)

    Wu, Honglin; Song, Yunfei; Yu, Guoyang; Wang, Yang; Wang, Chang; Yang, Yanqiang

    2016-05-01

    Femtosecond time-resolved transient grating (TG) technique was employed to get insight into the photodissociation mechanism of liquid nitromethane (NM). Broadband white-light continuum was introduced as the probe to observe the evolution of electronic excited states of NM molecules and the formation of photodissociation products simultaneously. The reaction channel of liquid NM under 266 nm excitation was obtained that NM molecules in excited state S2 relax through two channels: about 73% relax to low lying S1 state through S2/S1 internal conversion with a time constant of 0.24 ps and then go back to the ground state through S1/S0 internal conversion; the other 27% will dissociate with a time constant of 2.56 ps. NO2 was found to be one of the products from the experimental TG spectra, which confirmed that C-N bond rupture was the primary dissociation channel of liquid NM.

  19. Real space soft x-ray imaging at 10 nm spatial resolution

    SciTech Connect

    Chao, Weilun; Fischer, Peter; Tyliszczak, T.; Rekawa, Senajith; Anderson, Erik; Naulleau, Patrick

    2011-04-24

    Using Fresnel zone plates made with our robust nanofabrication processes, we have successfully achieved 10 nm spatial resolution with soft x-ray microscopy. The result, obtained with both a conventional full-field and scanning soft x-ray microscope, marks a significant step forward in extending the microscopy to truly nanoscale studies.

  20. Interpretation of cathodoluminescence spectra obtained from carbonate gangue minerals and breccias, Right Fork area, central Tennessee zinc district

    SciTech Connect

    Kopp, O.C. . Dept. of Geological Sciences); Owen, M.R. . Dept. of Geology); Fuller, E.L. Jr. . Metals and Ceramics Div.)

    1993-03-01

    Spectral patterns (from approximately 350 nm to 750 nm) were obtained for zoned dolomite and unzoned calcite gangue, and dolostone breccia fragments from the Right Fork area in Jackson and Overton Counties, 40 km northeast of the elmwood Mine in the Central Tennessee zinc district. The materials had been analyzed for Fe, Mn, REE, and other trace elements using the synchrotron XRF probe at the National Synchrotron Light Source, Brookhaven National Laboratory. Three distinct zones in dolomite gangue (arbitrarily named zones 4, 5, and 6) could be traced throughout the entire area. The largest number of spectra were obtained for zone 4, which luminesces medium bright red to the eye. The spectra reveal broad peaks in the vicinity of 460 nm and 660 nm; however, spectral deconvolution suggests that the spectra comprise several peaks. The broad peak at 460 nm may consist of overlapping peaks at about 430 nm and 530 nm. Of special interest is the broad peak at 660 nm, which is normally assigned solely to Mn. Shoulders in the range from 700 nm to 725 nm might be due to Fe, which is generally assumed to quench Mn-activated cathodoluminescence. Note that Fe[sup 3+] produces peaks in the vicinity of 550 nm and 710 nm in plagioclase. Intensities determined for zone 4 vary by a factor of 3X and are related to both the Mn concentrations and the Fe/Mn ratios of the individual spots analyzed, even though little, if any, differences in intensity are observed by eye.

  1. Suppression of high-order-harmonic intensities observed in aligned CO2 molecules with 1300-nm and 800-nm pulses

    NASA Astrophysics Data System (ADS)

    Kato, Kosaku; Minemoto, Shinichirou; Sakai, Hirofumi

    2011-08-01

    High-order-harmonic generation from aligned N2, O2, and CO2 molecules is investigated by 1300-nm and 800-nm pulses. The harmonic intensities of 1300-nm pulses from aligned molecules show harmonic photon energy dependence similar to those of 800-nm pulses. Suppression of harmonic intensity from aligned CO2 molecules is observed for both 1300- and 800-nm pulses over the same harmonic photon energy range. As the dominant mechanism for the harmonic intensity suppression from aligned CO2 molecules, the present results support the two-center interference picture rather than the dynamical interference picture.

  2. Ultrafast thin-disk multipass laser amplifier delivering 1.4 kW (4.7 mJ, 1030 nm) average power converted to 820 W at 515 nm and 234 W at 343 nm.

    PubMed

    Negel, Jan-Philipp; Loescher, André; Voss, Andreas; Bauer, Dominik; Sutter, Dirk; Killi, Alexander; Ahmed, Marwan Abdou; Graf, Thomas

    2015-08-10

    We report on an Yb:YAG thin-disk multipass laser amplifier delivering sub-8 ps pulses at a wavelength of 1030 nm with 1420 W of average output power and 4.7 mJ of pulse energy. The amplifier is seeded by a regenerative amplifier delivering 6.5 ps pulses with 300 kHz of repetition rate and an average power of 115 W. The optical efficiency of the multipass amplifier was measured to be 48% and the beam quality factor was better than M2 = 1.4. Furthermore we report on the external second harmonic generation from 1030 nm to 515 nm using an LBO crystal leading to an output power of 820 W with 2.7 mJ of energy per pulse. This corresponds to a conversion efficiency of 70%. Additionally, 234 W of average power were obtained at the third harmonic with a wavelength of 343 nm. PMID:26367957

  3. In die mask overlay control for 14nm double-patterning lithography

    NASA Astrophysics Data System (ADS)

    Chou, William; Cheng, James; Tseng, Alex C. P.; Wu, J. K.; Chang, Chin Kuei; Cheng, Jeffrey; Lee, Adder; Huang, Chain Ting; Peng, N. T.; Hsu, Simon C. C.; Yu, Chun Chi; Lu, Colbert; Yu, Julia; Craig, Peter; Pollock, Chuck; Ham, Young; McMurran, Jeff

    2015-10-01

    According to the ITRS roadmap, semiconductor industry drives the 193nm lithography to its limits, using techniques like Double Pattern Technology (DPT), Source Mask Optimization (SMO) and Inverse Lithography Technology (ILT). In terms of considering the photomask metrology, full in-die measurement capability is required for registration and overlay control with challenging specifications for repeatability and accuracy. Double patterning using 193nm immersion lithography has been adapted as the solution to enable 14nm technology nodes. The overlay control is one of the key figures for the successful realization of this technology. In addition to the various error contributions from the wafer scanner, the reticles play an important role in terms of considering lithographic process contributed errors. Accurate pattern placement of the features on reticles with a registration error below 4nm is mandatory to keep overall photomask contributions to overlay of sub 20nm logic within the allowed error budget. In this paper, we show in-die registration errors using 14nm DPT product masks, by measuring in-die overlay patterns comparing with regular registration patterns. The mask measurements are used to obtain an accurate model to predict mask contribution on wafer overlay of double patterning technology.

  4. HSQ double patterning process for 12 nm resolution x-ray zone plates

    SciTech Connect

    Chao, Weilun; Kim, Jihoon; Rekawa, Senajith; Fischer, Peter; Anderson, Erik H.

    2009-06-16

    Soft x-ray zone plate microscopy is a powerful nano-analytic technique used for a wide variety of scientific and technological studies. Pushing its spatial resolution to 10 nm and below is highly desired and feasible due to the short wavelength of soft x-rays. Instruments using Fresnel zone plate lenses achieve a spatial resolution approximately equal to the smallest, outer most zone width. We developed a double patterning zone plate fabrication process based on a high-resolution resist, hydrogen silsesquioxane (HSQ), to bypass the limitations of conventional single exposure fabrication to pattern density, such as finite beam size, scattering in resist and modest intrinsic resist contrast. To fabricate HSQ structures with zone widths in the order of 10 nm on gold plating base, a surface conditioning process with (3-mercaptopropyl) trimethoxysilane, 3-MPT, is used, which forms a homogeneous hydroxylation surface on gold surface and provides good anchoring for the desired HSQ structures. Using the new HSQ double patterning process, coupled with an internally developed, sub-pixel alignment algorithm, we have successfully fabricated in-house gold zone plates of 12 nm outer zones. Promising results for 10 nm zone plates have also been obtained. With the 12 nm zone plates, we have achieved a resolution of 12 nm using the full-field soft x-ray microscope, XM-1.

  5. Passivation of c-Si surfaces by sub-nm amorphous silicon capped with silicon nitride

    NASA Astrophysics Data System (ADS)

    Wan, Yimao; Yan, Di; Bullock, James; Zhang, Xinyu; Cuevas, Andres

    2015-12-01

    A sub-nm hydrogenated amorphous silicon (a-Si:H) film capped with silicon nitride (SiNx) is shown to provide a high level passivation to crystalline silicon (c-Si) surfaces. When passivated by a 0.8 nm a-Si:H/75 nm SiNx stack, recombination current density J0 values of 9, 11, 47, and 87 fA/cm2 are obtained on 10 Ω.cm n-type, 0.8 Ω.cm p-type, 160 Ω/sq phosphorus-diffused, and 120 Ω/sq boron-diffused silicon surfaces, respectively. The J0 on n-type 10 Ω.cm wafers is further reduced to 2.5 ± 0.5 fA/cm2 when the a-Si:H film thickness exceeds 2.5 nm. The passivation by the sub-nm a-Si:H/SiNx stack is thermally stable at 400 °C in N2 for 60 min on all four c-Si surfaces. Capacitance-voltage measurements reveal a reduction in interface defect density and film charge density with an increase in a-Si:H thickness. The nearly transparent sub-nm a-Si:H/SiNx stack is thus demonstrated to be a promising surface passivation and antireflection coating suitable for all types of surfaces encountered in high efficiency c-Si solar cells.

  6. Feasibility study of splitting pitch technology on 45-nm contact patterning with 0.93 NA

    NASA Astrophysics Data System (ADS)

    Cheng, Yung Feng; Chou, Yueh Lin; Tseng, Ting Cheng; Hsueh, Bo Yun; Yang, Chuen Huei

    2007-03-01

    As semiconductor process technology moves to smaller generations (65nm and beyond), the contact pattern printing becomes the most difficult challenge in the lithography field. The reason comes from the smaller feature size and pitch of contact/via pattern printing that is similar to 2D (two-dimensional) patterning. Contact and via patterns need better image contrast than line/space patterns in pattern printing. Hence, contact/via printing needs a higher k1 value than others. In 65nm generation experience, the k1 is ~0.44 on a 0.85 NA exposure tool. A larger NA exposure tool is expensive and developed slower than the motivation of generation. Hence, the process is difficult to achieve by obtaining larger NA exposure tools. The k1 requirement of 45nm (logic) contact pattering (minimum pitch: 140nm) is ~0.34 on a 0.93 NA exposure tool that is available currently. RET (resolution enhancement technology) is necessary to achieve the difficult process goal. Splitting pitch technology is an RET approach to solving 45nm contact pattering. In this paper, we use a 2P1E (2 photo exposure and 1 etching) approach to meet our process requirements. The original layout is split into dense pitch pattern and semi-iso to iso pattern parts by software. Utilizing strong OAI (off-axis-illumination) on dense pattern part and weak OAI on semi-iso to iso pattern part can obtain better process results.

  7. Laser ablation of ceramic Al2O3 at 193 nm and 248 nm: The importance of single-photon ionization processes

    NASA Astrophysics Data System (ADS)

    Peláez, R. J.; Afonso, C. N.; Bator, M.; Lippert, T.

    2013-06-01

    The aim of this work is to demonstrate that single-photon photoionization processes make a significant difference in the expansion and temperature of the plasma produced by laser ablation of ceramic Al2O3 in vacuum as well as to show their consequences in the kinetic energy distribution of the species that eventually will impact on the film properties produced by pulsed laser deposition. This work compares results obtained by mass spectrometry and optical spectroscopy on the composition and features of the plasma produced by laser ablation at 193 nm and 248 nm, i.e., photon energies that are, respectively, above and below the ionization potential of Al, and for fluences between threshold for visible plasma and up to ≈2 times higher. The results show that the ionic composition and excitation of the plasma as well as the ion kinetic energies are much higher at 193 nm than at 248 nm and, in the latter case, the population of excited ions is even negligible. The comparison of Maxwell-Boltzmann temperature, electron temperatures, and densities of the plasmas produced with the two laser wavelengths suggests that the expansion of the plasma produced at 248 nm is dominated by a single population. Instead, the one produced at 193 nm is consistent with the existence of two populations of cold and hot species, the latter associated to Al+ ions that travel at the forefront and produced by single photon ionization as well as Al neutrals and double ionized ions produced by electron-ion impact. The results also show that the most energetic Al neutrals in the plasma produced at the two studied wavelengths are in the ground state.

  8. Low-cost, broadly tunable (375-433 nm & 746-887 nm) Cr:LiCAF laser pumped by one single-spatial-mode diode.

    PubMed

    Demirbas, Umit; Uecker, Reinhard; Klimm, Detlef; Wang, Jing

    2012-12-10

    We describe a low-cost, compact, and efficient Cr(3+):LiCaAlF(6) (Cr:LiCAF) laser that is broadly tunable in the near infrared (746-887 nm) and blue/ultraviolet (375-433 nm) regions of the optical spectrum. The pump source is a 660 nm single-mode-diode with 145 mW of output power. A melt-grown Cr:LiCAF crystal with an extremely high figure of merit above 2000 was used as the gain medium. This enabled the construction of a high-Q-cavity with continuous wave (cw) lasing thresholds as low as 3 mW, slope efficiencies as high as 54%, and output powers up to 63 mW. The stored intracavity power levels were above 30 W. By placing a beta-barium-borate crystal at a second intracavity focus, we could obtain tunable cw blue/ultraviolet radiation with output powers up to 3.5 mW around 400 nm. When mode-locked using a saturable Bragg reflector around 800 nm, the Cr:LiCAF laser produced 95 fs pulses with average powers of 33 mW and peak powers of 3.58 kW at a repetition rate of 85.5 MHz. Extracavity second harmonic generation enables generation of femtosecond pulses around 400 nm. These results demonstrate the possibility to grow Cr:LiCAF crystals with passive losses below 0.15% per cm, which enables construction of low-cost and complexity systems that are pumped only with one low-power single-mode-diode. PMID:23262540

  9. Investigation of the low power stage of an 1178nm Raman system

    NASA Astrophysics Data System (ADS)

    Henry, Leanne J.; Klopfer, Michael; Mart, Cody; Grosek, Jacob; Jain, Ravinder

    2014-03-01

    An 1178 nm seeded and 1069 nm pumped Raman laser system where the second Stokes is amplified in a 1121 nm resonator defined by high reflector fiber Bragg gratings (FBGs) has the potential of producing high output power of narrow linewidth 1178 nm. However, 1121 nm power leakage out of the resonator cavity around the gratings was found to impact the performance of the laser and needs to be dealt with in order to obtain high 1178 nm output power levels. In order to address this problem, the causes of linewidth broadening must be understood. A fully nonlinear model has been built which involves propagation of the spectral wave shape via the nonlinear Schrödinger equation in addition to the Raman processes. It was found that increases in 1121 nm cavity power, fiber Bragg grating bandwidth, and the nonlinear index of refraction n2, as well as a decrease in group velocity dispersion β 2 leads to an increase in linewidth broadening. It is concluded that the magnitude of linewidth broadening seen experimentally can only be explained if the spectral components outside the bandwidth of the FBGs are being amplified. Experimentally, 1121 nm power leakage can be handled by using a three wavelength WDM on either side of the rare earth doped amplifier. In addition, usage of a fiber having a high value for group velocity dispersion and/or a low value for nonlinear index of refraction n2 in addition to narrower bandwidth fiber Bragg gratings may help reduce the amount of linewidth broadening.

  10. Our perspective of the treatment of naevus of Ota with 1,064-, 755- and 532-nm wavelength lasers.

    PubMed

    Felton, S J; Al-Niaimi, F; Ferguson, J E; Madan, V

    2014-09-01

    Naevus of Ota (NO) is a disfiguring pigmentary disorder affecting the face. Q-switched neodymium-doped yttrium aluminium garnet (QS Nd:YAG)-1,064 nm is a standard laser treatment because it causes highly selective destruction of melanin within the aberrant dermal melanocytes. However, not all lesions respond. This study aims to evaluate the efficacy/safety of QS Nd:YAG-1,064 nm and the shorter wavelength QS Alexandrite-755 nm and QS Nd:YAG-532 nm lasers in treating NO. Data were evaluated from 21 patients treated in our laser centre from 2004 to 2012. Lesional skin was irradiated with QS-532 nm/QS-755 nm/QS-1,064 nm, with settings titrated according to responses. All received initial test patches to direct initial wavelength choice, with subsequent treatments at 3-monthly intervals until clearance/lack of further response. Laser modality was switched following repeated test patches if there was no or no sustained improvement. Two thirds of patients had ≥ 90% improvement compared to baseline photographs. In 20% of patients, QS-1,064 nm was most efficacious with 97% mean improvement. The mean improvement was 80% for those in whom QS-755 nm was superior, and 90% for QS-532 nm. Median number of overall laser treatments was 8 (range 4-13). Number of treatments required varied significantly according to lesional colour and site: grey lesions and those on the forehead/temple were most resistant. We confirm successful treatment of NO with QS Nd:YAG-1,064 nm and the shorter wavelength QS-755 nm/QS-532 nm lasers without serious or irreversible side effects. We recommend judicious test patch analysis before treatment and a modality switch if complete clearance is not obtained. PMID:23640036

  11. Novel high refractive index fluids for 193nm immersion lithography

    NASA Astrophysics Data System (ADS)

    Santillan, Julius; Otoguro, Akihiko; Itani, Toshiro; Fujii, Kiyoshi; Kagayama, Akifumi; Nakano, Takashi; Nakayama, Norio; Tamatani, Hiroaki; Fukuda, Shin

    2006-03-01

    Despite the early skepticism towards the use of 193-nm immersion lithography as the next step in satisfying Moore's law, it continuous to meet expectations on its feasibility in achieving 65-nm nodes and possibly beyond. And with implementation underway, interest in extending its capability for smaller pattern sizes such as the 32-nm node continues to grow. In this paper, we will discuss the optical, physical and lithographic properties of newly developed high index fluids of low absorption coefficient, 'Babylon' and 'Delphi'. As evaluated in a spectroscopic ellipsometer in the 193.39nm wavelength, the 'Babylon' and 'Delphi' high index fluids were evaluated to have a refractive index of 1.64 and 1.63 with an absorption coefficient of 0.05/cm and 0.08/cm, respectively. Lithographic evaluation results using a 193-nm 2-beam interferometric exposure tool show the imaging capability of both high index fluids to be 32-nm half pitch lines and spaces.

  12. Temperature characteristic of 808nm VCSELs with large aperture

    NASA Astrophysics Data System (ADS)

    Feng, Yuan; Feng, Dawei; Hao, Yongqin; Wang, Yong; Yan, Changling; Lu, Peng; Li, Yang

    2015-03-01

    In order to study the output characteristics of 808nm vertical cavity surface emitting laser(VCSEL) with large aperture at different temperature, 808nm VCSEL with 500μm emitting diameter are fabricated with Reticular Electrode Structure(RES). Lasing wavelength, optical power and the threshold current are measured by changing the temperature of heat sink. And an output power of 0.42W is achieved at 1.3A at room temperature under continuous wave operation. The central wavelength is 803.32nm, and the full width at half maximum is 0.16nm, the temperature shift is 0.06nm/°, the thermal resistance is 0.098°/mW. The testing results show that 808nm VCSEL with large aperture is good temperature characteristic.

  13. Laboratory Measurements of the 940, 1130, and 1370 nm Water Vapor Absorption Band Profiles

    NASA Technical Reports Server (NTRS)

    Giver, Lawrence P.; Gore, Warren J.; Pilewskie, P.; Freedman, R. S.; Chackerian, C., Jr.; Varanasi, P.

    2001-01-01

    We have used the solar spectral flux radiometer (SSFR) flight instrument with the Ames 25 meter base-path White cell to obtain about 20 moderate resolution (8 nm) pure water vapor spectra from 650 to 1650 nm, with absorbing paths from 806 to 1506 meters and pressures up to 14 torr. We also obtained a set at 806 meters with several different air-broadening pressures. Model simulations were made for the 940, 1130, and 1370 nm absorption bands for some of these laboratory conditions using the Rothman, et al HITRAN-2000 linelist. This new compilation of HITRAN includes new intensity measurements for the 940 nm region. We compared simulations for our spectra of this band using HITRAN-2000 with simulations using the prior HITRAN-1996. The simulations of the 1130 nm band show about 10% less absorption than we measured. There is some evidence that the total intensity of this band is about 38% stronger than the sum of the HITRAN line intensities in this region. In our laboratory conditions the absorption depends approximately on the square root of the intensity. Thus, our measurements agree that the band is stronger than tabulated in HITRAN, but by about 20%, substantially less than the published value. Significant differences have been shown between Doppler-limited resolution spectra of the 1370 nm band obtained at the Pacific Northwest National Laboratory and HITRAN simulations. Additional new intensity measurements in this region are continuing to be made. We expect the simulations of our SSFR lab data of this band will show the relative importance of improving the HITRAN line intensities of this band for atmospheric measurements.

  14. Segmentation of the macular choroid in OCT images acquired at 830nm and 1060nm

    NASA Astrophysics Data System (ADS)

    Lee, Sieun; Beg, Mirza F.; Sarunic, Marinko V.

    2013-06-01

    Retinal imaging with optical coherence tomography (OCT) has rapidly advanced in ophthalmic applications with the broad availability of Fourier domain (FD) technology in commercial systems. The high sensitivity afforded by FD-OCT has enabled imaging of the choroid, a layer of blood vessels serving the outer retina. Improved visualization of the choroid and the choroid-sclera boundary has been investigated using techniques such as enhanced depth imaging (EDI), and also with OCT systems operating in the 1060-nm wavelength range. We report on a comparison of imaging the macular choroid with commercial and prototype OCT systems, and present automated 3D segmentation of the choroid-scleral layer using a graph cut algorithm. The thickness of the choroid is an important measurement to investigate for possible correlation with severity, or possibly early diagnosis, of diseases such as age-related macular degeneration.

  15. Versatile 1 W narrow band 976 nm and 1064 nm light sources

    NASA Astrophysics Data System (ADS)

    Mohrdiek, S.; Pfeiffer, H.-U.; Zibik, E. A.; Sverdlov, B.; Pliska, T.; Lichtenstein, N.

    2011-02-01

    We report on development of novel curved waveguide (CWG) laser devices, where the emission wavelength centered at ~976 nm is stabilized to a 20 dB bandwidth of less than 100 picometer by using fiber Bragg gratings (FBG). Radiation from the curved waveguide laser is coupled using an anamorphic fiber lens into a single mode polarization maintaining fiber containing the FBG, the latter acting as a front reflector. The high power gain chip is based on Oclaro's InGaAs/AlGaAs quantum well laser. Use of the curved waveguide geometry allows to eliminate residual reflections in the optical path of the cavity, which is formed by the rear chip facet and the FBG. It is well known that additional reflections lead to significant deterioration of the spectral and power stability. The devices, assembled in telecom type housings, provide up to 1 W of low-noise and kink-free CW power. In addition pulse operation in nanosecond range is also investigated. The spectral stabilization time to the wavelength of the FBG is limited by the external cavity roundtrip of ~2 ns. A side mode suppression ratio of about 40 dB and higher is achieved for pulsed and CW operation. Results are also presented for a device at 1064 nm. Numerous applications can be envisioned for these devices. For instance devices with high power and ultranarrow spectral bandwidth allow greater flexibility in the choice of parameters for frequency conversion applications. In pulsed mode the device can be used in the special sensing applications where spectral stability is crucial.

  16. Detection limits of 405 nm and 633 nm excited PpIX fluorescence for brain tumor detection during stereotactic biopsy

    NASA Astrophysics Data System (ADS)

    Markwardt, Niklas; Götz, Marcus; Haj-Hosseini, Neda; Hollnburger, Bastian; Sroka, Ronald; Stepp, Herbert; Zelenkov, Petr; Rühm, Adrian

    2016-04-01

    5-aminolevulinic-acid-(5-ALA)-induced protoporphyrin IX (PpIX) fluorescence may be used to improve stereotactic brain tumor biopsies. In this study, the sensitivity of PpIX-based tumor detection has been investigated for two potential excitation wavelengths (405 nm, 633 nm). Using a 200 μm fiber in contact with semi-infinite optical phantoms containing ink and Lipovenös, PpIX detection limits of 4.0 nM and 200 nM (relating to 1 mW excitation power) were determined for 405 nm and 633 nm excitation, respectively. Hence, typical PpIX concentrations in glioblastomas of a few μM should be well detectable with both wavelengths. Additionally, blood layers of selected thicknesses were placed between fiber and phantom. Red excitation was shown to be considerably less affected by blood interference: A 50 μm blood layer, for instance, blocked the 405- nm-excited fluorescence completely, but reduced the 633-nm-excited signal by less than 50%. Ray tracing simulations demonstrated that - without blood layer - the sensitivity advantage of 405 nm rises for decreasing fluorescent volume from 50-fold to a maximum of 100-fold. However, at a tumor volume of 1 mm3, which is a typical biopsy sample size, the 633-nm-excited fluorescence signal is only reduced by about 10%. Further simulations revealed that with increasing fiber-tumor distance, the signal drops faster for 405 nm. This reduces the risk of detecting tumor tissue outside the needle's coverage, but diminishes the overlap between optically and mechanically sampled volumes. While 405 nm generally offers a higher sensitivity, 633 nm is more sensitive to distant tumors and considerably superior in case of blood-covered tumor tissue.

  17. 40nm tunable multi-wavelength fiber laser

    NASA Astrophysics Data System (ADS)

    Jia, Qingsong; Wang, Tianshu; Zhang, Peng; Dong, Keyan; Jiang, Huilin

    2014-12-01

    A Brillouin-Erbium multi-wavelength tunable fiber laser at C-band is demostrated. A 10 km long singlemode fiber(SMF), a 6 m long Erbium-doped fiber, two couplers, a wavelength division multiplexer, a isolator, an optical circulator, a 980nm pump laser and a narrow linewidth tunable laser are included in the structure. A segment of 10 km-long single-mode fiber (SMF) between the two ports of a 1×2 coupler is used as Brillouin gain. Ebiumdoped fiber amplifier (EDFA) consists of a segment of 6m er-doped fiber pumped by 980nm laser dioder . A narrow linewidth tunable laser from 1527 to 1607 nm as Brillouin bump, At the Brillouin pump power of 8mW and the 980 nm pump power of 400 mw, 16 output channels with 0.08 nm spacing and tuning range of 40 nm from 1527 nm to 1567 nm are achieved. We realize the tunable output of wavelength by adjusting the 980 nm pump power and the Brillouin pump wavelength. Stability of the multiwavelength fiber laser is also observed.

  18. 7nm logic optical lithography with OPC-Lite

    NASA Astrophysics Data System (ADS)

    Smayling, Michael C.; Tsujita, Koichiro; Yaegashi, Hidetami; Axelrad, Valery; Nakayama, Ryo; Oyama, Kenichi; Yamauchi, Shohei; Ishii, Hiroyuki; Mikami, Koji

    2015-03-01

    The CMOS logic 22nm node was the last one done with single patterning. It used a highly regular layout style with Gridded Design Rules (GDR). Smaller nodes have required the same regular layout style but with multiple patterning for critical layers. A "line/cut" approach is being used to achieve good pattern fidelity and process margin.[1] As shown in Fig. 1, even with "line" patterns, pitch division will eventually be necessary. For the "cut" pattern, Design-Source-Mask Optimization (DSMO) has been demonstrated to be effective at the 20nm node and below.[2,3,4] Single patterning was found to be suitable down to 16nm, while double patterning extended optical lithography for cuts to the 10-12nm nodes. Design optimization avoided the need for triple patterning. Lines can be patterned with 193nm immersion with no complex OPC. The final line dimensions can be achieved by applying pitch division by two or four.[5] In this study, we extend the scaling using simplified OPC to the 7nm node for critical FEOL and BEOL layers. The test block is a reasonably complex logic function with ~100k gates of combinatorial logic and flip-flops, scaled from previous experiments. Simulation results show that for cuts at 7nm logic dimensions, the gate layer can be done with single patterning whose minimum pitch is 53nm, possibly some of the 1x metal layers can be done with double patterning whose minimum pitch is 53nm, and the contact layer will require triple patterning whose minimum pitch is 68nm. These pitches are less than the resolution limit of ArF NA=1.35 (72nm). However these patterns can be separated by a combination of innovative SMO for less than optical resolution limit and a process trick of hole-repair technique. An example of triple patterning coloring is shown in Fig 3. Fin and local interconnect are created by lines and trims. The number of trim patterns are 3 times (min. pitch=90nm) and twice (min. pitch=120nm), respectively. The small number of masks, large pitches, and

  19. Polarization-dependent aluminum metasurface operating at 450 nm.

    PubMed

    Højlund-Nielsen, Emil; Zhu, Xiaolong; Carstensen, Marcus S; Sørensen, Michael K; Vannahme, Christoph; Asger Mortensen, N; Kristensen, Anders

    2015-11-01

    We report on a polarization-dependent plasmonic aluminum-based high-density metasurface operating at blue wavelengths. The fabricated sub-wavelength structures, tailored in size and geometry, possess strong, localized, plasmonic resonances able to control linear polarization. Best performance is achieved by rotating an elongated rectangular structure of length 180 nm and width 110 nm inside a square lattice of period 250 nm. In the case of 45 degrees rotation of the structure with respect to the lattice, the normal-incidence reflectance drops around the resonance wavelength of 457 nm from about 60 percent to below 2 percent. PMID:26561151

  20. First results from AIMS beta tool for 157-nm lithography

    NASA Astrophysics Data System (ADS)

    Teuber, Silvio; Higashikawa, Iwao; Urbach, Jan-Peter; Schilz, Christof M.; Koehle, Roderick; Zibold, Axel M.

    2004-05-01

    In modern mask manufacturing, a successful defect mitigation strategy has been become crucial to achieve defect free masks for high-end lithography. The basic steps of such a strategy include inspection, repair, and subsequent post-repair qualification of repair sites. For the latter task, actinic aerial image measurements have been proven to be the technique of choice to assess the printability of a repaired site. In the last three years, International SEMATECH in cooperation with Infineon/AMTC-Dresden and SELETE, funded a joint development project at Carl Zeiss to develop an AIMS tool operating at the 157nm wavelength. The three beta tools were shipped in 2003 to the three beta customer sites. In this paper are presented the first results obtained with these beta tools, including measurements on binary as well as alternating phase shift masks. The technical properties of the tool were discussed with regards to the capability of the tool for defect qualification on photomasks. Additionally, preliminary results of the evaluation of alternating phase shift masks will be discussed, including measurements performed on dense lines-and-spaces structures with various pitch sizes.

  1. Ageing of optical components under laser irradiation at 532nm

    NASA Astrophysics Data System (ADS)

    Becker, S.; Delrive, L.; Bouchut, P.; Andre, B.; Geffraye, F.

    2005-09-01

    The pulsed Laser Induced Damage Threshold (LIDT) of optical components usually reaches several hundreds of MW/cm2. When exposed to laser power several order of magnitude below their LIDT, the optical component lifetime is, by default, considered infinite. Under specific conditions, the accumulation of laser pulses may lead to a contamination of the surface and a degradation of its optical properties and LIDT. In the first order, these phenomena depend on the experimental conditions such as the irradiation time, the laser power, and the environment. In order to better understand the physics emphasizing this degradation, we developed an experimental cell with an in-situ spectroscopic ellipsometry diagnostic. The dry-pumped cell sheltering the sample is associated with a mass spectrometer that enables us to follow the environmental conditions in which we experiment the ageing. Anti-reflection coatings on fused silica were tested under 10 kHz-532 nm laser ageing. We present first results of degradation obtained in these conditions.

  2. Fluorescence near-field microscopy of DNA at sub-10 nm resolution.

    PubMed

    Ma, Ziyang; Gerton, Jordan M; Wade, Lawrence A; Quake, Stephen R

    2006-12-31

    We demonstrate apertureless near-field microscopy of single molecules at sub-10 nm resolution. With a novel phase filter, near-field images of single organic fluorophores were obtained with approximately sixfold improvement in the signal-to-noise ratio. The improvement allowed pairs of molecules separated by approximately 15 nm to be reliably and repeatedly resolved, thus demonstrating the first true Rayleigh resolution test for near-field images of single molecules. The potential of this technique for biological applications was demonstrated with an experiment that measured the helical rise of A-form DNA. PMID:17280412

  3. Hard-x-ray microscopy with Fresnel zone plates reaches 40 nm Rayleigh resolution

    SciTech Connect

    Chu, Y. S.; Yi, J. M.; De Carlo, F.; Shen, Q.; Lee, Wah-Keat; Wu, H. J.; Wang, C. L.; Wang, J. Y.; Liu, C. J.; Wang, C. H.; Wu, S. R.; Chien, C. C.; Hwu, Y.; Tkachuk, A.; Yun, W.; Feser, M.; Liang, K. S.; Yang, C. S.; Je, J. H.; Margaritondo, G.

    2008-03-10

    Substantial improvements in the nanofabrication and characteristics of gold Fresnel zone plates yielded unprecedented resolution levels in hard-x-ray microscopy. Tests performed on a variety of specimens with 8-10 keV photons demonstrated a first-order lateral resolution below 40 nm based on the Rayleigh criterion. Combined with the use of a phase contrast technique, this makes it possible to view features in the 30 nm range; good-quality images can be obtained at video rate, down to 50 ms/frame. The important repercussions on materials science, nanotechnology, and the life sciences are discussed.

  4. 11 W single gain-chip dilute nitride disk laser emitting around 1180 nm.

    PubMed

    Korpijärvi, Ville-Markus; Leinonen, Tomi; Puustinen, Janne; Härkönen, Antti; Guina, Mircea D

    2010-12-01

    We report power scaling experiments of a GaInNAs/GaAs-based semiconductor disk laser operating at ~1180 nm. Using a single gain chip cooled to mount temperature of ~10 °C we obtained 11 W of output power. For efficient thermal management we used a water-cooled microchannel mount and an intracavity diamond heat spreader. Laser performance was studied using different spot sizes of the pump beam on the gain chip and different output couplers. Intracavity frequency-doubling experiments led to generation of ~6.2 W of laser radiation at ~590 nm, a wavelength relevant for the development of sodium laser guide stars. PMID:21164909

  5. Microsystem 671 nm light source for shifted excitation Raman difference spectroscopy.

    PubMed

    Maiwald, Martin; Schmidt, Heinar; Sumpf, Bernd; Erbert, Götz; Kronfeldt, Heinz-Detlef; Tränkle, Günther

    2009-05-20

    We present a compact wavelength stabilized diode laser system at 671 nm on a micro-optical bench as a light source for shifted excitation Raman difference spectroscopy (SERDS). The laser system consists of two broad-area gain media in separate laser cavities using two reflection Bragg gratings with slightly different center wavelengths. A spectral width below 100 pm and a constant wavelength shift of 0.57 +/- 0.06 nm is obtained up to output powers of 250 mW. The suitability of this light source for SERDS is demonstrated using Raman spectra of ethanol with increasing concentrations of Cresyl Violet as the fluorescent contaminant. PMID:19458726

  6. Sub-500-nm patterning of glass by nanosecond KrF excimer laser ablation

    NASA Astrophysics Data System (ADS)

    Bekesi, J.; Meinertz, J.; Simon, P.; Ihlemann, J.

    2013-01-01

    The surface of flint glass of type F2 is patterned by nanosecond KrF excimer laser ablation. Strong UV absorption provides a comparatively low ablation threshold and precise ablation contours. By using a two-grating interferometer, periodic surface patterns with 330 nm period and 100 nm modulation depth are obtained. This method enables the fabrication of 7 mm×13 mm wide grating areas with perfectly aligned grooves without the need of high-precision sample positioning. By double exposure, crossed gratings with adjustable depths in the two orthogonal directions can be generated.

  7. Fiber-laser pumped actively Q-switched Er:LuYAG laser at 1648 nm

    NASA Astrophysics Data System (ADS)

    Yang, X. F.; Wang, Y.; Zhao, T.; Zhu, H. Y.; Shen, D. Y.

    2016-02-01

    We demonstrated an acousto-optic Q-switched 1648 nm Er:LuYAG laser resonantly pumped by a cladding-pumped Er,Yb fiber laser at 1532 nm. Stable Q-switching operation was obtained with the pulse repetition rate (PRR) varying from 200 Hz to 10 kHz. At PRR of 200 Hz, the laser yielded Q-switched pulses with 3.3 mJ pulse energy and 65 ns pulse duration, corresponding to a peak power of 50.7 kW for 10.4 W of incident pump power.

  8. Generation and use of high power 213 nm and 266 nm laser radiation and tunable 210-400 nm laser radiation with BBO crystal matrix array

    DOEpatents

    Gruen, Dieter M.

    2000-01-01

    A 213 nm laser beam is capable of single photon ablative photodecomposition for the removal of a polymer or biological material substrate. Breaking the molecular bonds and displacing the molecules away from the substrate in a very short time period results in most of the laser photon energy being carried away by the displaced molecules, thus minimizing thermal damage to the substrate. The incident laser beam may be unfocussed and is preferably produced by quintupling the 1064 nm radiation from a Nd:YAG solid state laser, i.e., at 213 nm. In one application, the 213 nm laser beam is expanded in cross section and directed through a plurality of small beta barium borate (BBO) crystals for increasing the energy per photon of the laser radiation directed onto the substrate. The BBO crystals are arranged in a crystal matrix array to provide a large laser beam transmission area capable of accommodating high energy laser radiation without damaging the BBO crystals. The BBO crystal matrix array may also be used with 266 nm laser radiation for carrying out single or multi photon ablative photodecomposition. The BBO crystal matrix array may also be used in an optical parametric oscillator mode to generate high power tunable laser radiation in the range of 210-400 nm.

  9. A Sounding Rocket Mission Concept to Acquire High-Resolution Radiometric Spectra Spanning the 9 nm - 31 nm Wavelength Range

    NASA Technical Reports Server (NTRS)

    Krause, L. Habash; Cirtain, Jonathan; McGuirck, Michael; Pavelitz, Steven; Weber, Ed.; Winebarger, Amy

    2012-01-01

    When studying Solar Extreme Ultraviolet (EUV) emissions, both single-wavelength, two- dimensional (2D) spectroheliograms and multi-wavelength, one-dimensional (1D) line spectra are important, especially for a thorough understanding of the complex processes in the solar magnetized plasma from the base of the chromosphere through the corona. 2D image data are required for a detailed study of spatial structures, whereas radiometric (i.e., spectral) data provide information on relevant atomic excitation/ionization state densities (and thus temperature). Using both imaging and radiometric techniques, several satellite missions presently study solar dynamics in the EUV, including the Solar Dynamics Observatory (SDO), Hinode, and the Solar-Terrestrial Relations Observatory (STEREO). The EUV wavelengths of interest typically span 9 nm to 31 nm, with the shorter wavelengths being associated with the hottest features (e.g., intense flares and bright points) and the longer wavelengths associated with cooler features (e.g., coronal holes and filaments). Because the optical components of satellite instruments degrade over time, it is not uncommon to conduct sounding rocket underflights for calibration purposes. The authors have designed a radiometric sounding rocket payload that could serve as both a calibration underflight for and a complementary scientific mission to the upcoming Solar Ultraviolet Imager (SUVI) mission aboard the GOES-R satellite (scheduled for a 2015 launch). The challenge to provide quality radiometric line spectra over the 9-31 nm range covered by SUVI was driven by the multilayer coatings required to make the optical components, including mirrors and gratings, reflective over the entire range. Typically, these multilayers provide useful EUV reflectances over bandwidths of a few nm. Our solution to this problem was to employ a three-telescope system in which the optical components were coated with multilayers that spanned three wavelength ranges to cover

  10. Flash-lamp pumped Pr:YAP laser operated at wavelengths of 747 nm and 662 nm

    NASA Astrophysics Data System (ADS)

    Fibrich, Martin; Jelínková, Helena; Šulc, Jan; Nejezchleb, Karel; Škoda, Václav

    2009-02-01

    Successful room-temperature generation of Pr:YAP laser radiation at wavelengths of 747 nm and 662 nm was demonstrated. A flash-lamp pumped Pr:YAP laser was operated in free-running pulsed regime at room temperature. Permanent laser action was reached by means of a special UV color glass plate filter placed directly into the laser cavity. The maximum output energy and pulse length reached at wavelengths of 747 nm and 662 nm were 102 mJ, 92 μs and 6.1 mJ, 47.5 μs, respectively. The laser beam parameter M2 ~ 1.5 was measured when the 662 nm wavelength was generated. In the case of 747 nm wavelength generation, M2 ~ 1.2 was reached with a diaphragm inside the resonator. For different pumped energy values, the line shape and linewidth remained stable for both cases.

  11. Diode-pumped Nd:LuVO 4-Nd:YLiF 4 crystals blue laser at 489 nm by intracavity sum-frequency-mixing

    NASA Astrophysics Data System (ADS)

    Lü, Yan-Fei; Zhang, Xi-He; Xia, Jing; Li, Chang-Li; Zhao, Zhen-Ming; Liu, Zhi-Teng

    2010-08-01

    We present a laser architecture to obtain continuous-wave blue radiation at 489 nm. An 809 nm diode-pumped the Nd:LuVO 4 crystal emitting at 916 nm. A part of the pump power was then absorbed by the Nd:LuVO 4 crystal. The remaining was used to pump the Nd:YLiF 4 (Nd:YLF) crystal emitting at 1047 nm. Intracavity sum-frequency mixing at 916 and 1047 nm was then realized in a LiB 3O 5 (LBO) crystal to reach the blue radiation. We obtained a continuous-wave output power of 425 mW at 489 nm with a pump laser diode emitting 18.4 W at 809 nm.

  12. CW light sources at the 589 nm sodium D2 line by sum-frequency mixing of diode pumped neodymium lasers

    NASA Astrophysics Data System (ADS)

    Lü, Y. F.; Lu, J.; Xu, L. J.; Sun, G. C.; Zhao, Z. M.; Gao, X.; Lin, J. Q.

    2010-10-01

    We present a laser architecture to obtain continuous-wave (CW) light sources at the 589 nm sodium D2 line. A 808 nm diode-pumped a Nd:YLiF4 (Nd:YLF) crystal emitting at 1053 nm. A part of the pump power was then absorbed by the Nd:YLF crystal. The remaining was used to pump a Nd:YAG crystal emitting at 1338 nm. Intracavity sum-frequency mixing at 1053 and 1338 nm was then realized in a LiB3O5 (LBO) crystal to reach the yellow-orange radiation. We obtained a CW output power of 235 mW at 589 nm with a pump laser diode emitting 17.8 W at 808 nm.

  13. Diode-pumped quasi-three-level Nd:GdV O4-Nd:YAG sum-frequency laser at 464 nm

    NASA Astrophysics Data System (ADS)

    Lu, Jie

    2014-04-01

    We report a laser architecture to obtain continuous-wave (cw) blue radiation at 464 nm. A 808 nm diode pumped a Nd:GdV O4 crystal emitting at 912 nm. A part of the pump power was then absorbed by the Nd:GdV O4 crystal. The remainder was used to pump a Nd:YAG crystal emitting at 946 nm. Intracavity sum-frequency mixing at 912 and 946 nm was then realized in a LiB3O5 (LBO) crystal to produce blue radiation. We obtained a cw output power of 1.52 W at 464 nm with a pump laser diode emitting 18.4 W at 808 nm.

  14. An efficient continuous-wave 591 nm light source based on sum-frequency mixing of a diode pumped Nd:GdVO4-Nd:CNGG laser

    NASA Astrophysics Data System (ADS)

    Zhao, Y. D.; Liu, J. H.

    2013-08-01

    We report a laser architecture to obtain continuous-wave (CW) yellow-orange light sources at the 591 nm wavelength. An 808 nm diode pumped a Nd:GdVO4 crystal emitting at 1063 nm. A part of the pump power was then absorbed by the Nd:CNGG crystal. The remaining pump power was used to pump a Nd:CNGG crystal emitting at 1329 nm. Intracavity sum-frequency mixing at 1063 and 1329 nm was then realized in a LiB3O5 (LBO) crystal to reach the yellow-orange radiation. We obtained a CW output power of 494 mW at 591 nm with a pump laser diode emitting 17.8 W at 808 nm.

  15. Evaluation of dental pulp repair using low level laser therapy (688 nm and 785 nm) morphologic study in capuchin monkeys

    NASA Astrophysics Data System (ADS)

    Pretel, H.; Oliveira, J. A.; Lizarelli, R. F. Z.; Ramalho, L. T. O.

    2009-02-01

    The aim of this study was to evaluate the hypothesis that low-level laser therapy (LLLT) 688 nm and 785 nm accelerate dentin barrier formation and repair process after traumatic pulp exposure. The sample consisted of 45 premolars of capuchin monkeys (Cebus apella) with pulp exposure Class V cavities. All premolars were treated with calcium hydroxide (Ca(OH)2), divided in groups of 15 teeth each, and analyzed on 7th, 25th, and 60th day. Group GI - only Ca(OH)2, GII - laser 688 nm, and GIII - laser 785 nm. Laser beam was used in single and punctual dose with the parameters: continuous, 688 nm and 785 nm wavelength, tip's area of 0.00785 cm2, power 50 mW, application time 20 s, dose 255 J/cm2, energy 2 J. Teeth were capped with Ca(OH)2, Ca(OH)2 cement and restored with amalgam. All groups presented pulp repair. On 25th day the thickness of the formed dentin barrier was different between the groups GI and GII (p < 0.05) and between groups GI and GIII (p < 0.01). On 60th day there was difference between GI and GIII (p < 0.01). It may be concluded that, LLLT 688 nm and 785 nm accelerated dentin barrier formation and consequently pulp repair process, with best results using infrared laser 785 nm.

  16. Demonstration of miniaturized 20mW CW 280nm and 266nm solid-state UV laser sources

    NASA Astrophysics Data System (ADS)

    Landru, Nicolas; Georges, Thierry; Beaurepaire, Julien; Le Guen, Bruno; Le Bail, Guy

    2015-02-01

    Visible 561 nm and 532 nm laser emissions from 14-mm long DPSS monolithic cavities are frequency converted to deep UV 280 nm and 266 nm in 16-mm long monolithic external cavities. Wavelength conversion is fully insensitive to mechanical vibrations and the whole UV laser sources fit in a miniaturized housing. More than 20 mW deep UV laser emission is demonstrated with high power stability, low noise and good beam quality. Aging tests are in progress but long lifetimes are expected thanks to the cavity design. Protein detection and deep UV resonant Raman spectroscopy are applications that could benefit from these laser sources.

  17. Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology

    NASA Astrophysics Data System (ADS)

    Hsu, Michael; Van Den Broeke, Doug; Laidig, Tom; Wampler, Kurt E.; Hollerbach, Uwe; Socha, Robert; Chen, J. F.; Hsu, Stephen; Shi, Xuelong

    2005-06-01

    Scattering Bars (SB) OPC, together with optimized illumination, is no doubt one of the critical enablers for low k1 lithography manufacturing. The manufacturing implementation of SB so far has been mainly based on rule-based approach. While this has been working well, a more effective model-based approach is much more desired lithographically for manufacturing at 65nm and 45nm nodes. This is necessary to ensure sufficient process margin using hyper NA for patterning random IC design. In our model-based SB (M-SB) OPC implementation, we have based on the patented IML Technology from ASML MaskTools. In this report, we use both dark field contact hole and clear field poly gate mask to demonstrate this implementation methodology. It is also quite applicable for dark field trench masks, such as local interconnect mask with damascene metal. For our full-chip implementation flow, the first step is to determine the critical design area and then to proceed with NA and illumination optimization. We show that, using LithoCruiser, we are able to select the best NA in combination with optimum illumination via a Diffraction Optical Element (DOE). The decision to use a custom DOE or one from the available DOE library from ASML can be made based on predicted process performance and cost effectiveness. With optimized illumination, it is now possible to construct an interference map for the full-chip mask pattern. Utilizing the interference map, M-SB OPC is generated. Next, model OPC can be applied with the presence of M-SB for the entire chip. It is important to note here, that from our experience, the model OPC must be calibrated with the presence of SB in order to achieve the desired accuracy. We report the full-chip processing benchmark using MaskWeaver to apply both M-SB and model OPC. For actual patterning performance, we have verified the full chip OPC treatment using SLiC, a DFM tool from Cadence. This implementation methodology can be applied to binary chrome mask

  18. Synthesis of WS2 Nanowires as Efficient 808 nm-Laser-Driven Photothermal Nanoagents.

    PubMed

    Macharia, Daniel K; Yu, Nuo; Zhong, Runzhi; Xiao, Zhiyin; Yang, Jianmao; Chen, Zhigang

    2016-06-01

    A prerequisite for the development of photothermal ablation therapy for cancer is to obtain efficient photothermal nanoagents that can be irradiated by near-infrared (NIR) laser. Herein, we have reported the synthesis of WS2 nanowires as photothermal nanoagents by the reaction of WCl6 with CS2 in oleylamine at 280 degrees C. WS2 nanowires have the thickness of -2 nm and length of -100 nm. Importantly, the chloroform dispersion of WS2 nanowires exhibits strong photoabsorption in NIR region. The temperature of the dispersion (0.10-0.50 mg/mL) can increase by 12.8-23.9 degrees C in 5 min under the irradiation of 808 nm laser with a power density of 0.80 W/cm2. Therefore, WS2 nanowires have a great superiority as a new nanoagent for NIR-induced photothermal ablation of cancer, due to their small size and excellent photothermal performance. PMID:27427645

  19. A compact ultranarrow high-power laser system for experiments with 578 nm ytterbium clock transition

    SciTech Connect

    Cappellini, G.; Lombardi, P.; Mancini, M.; Pagano, G.; Pizzocaro, M.; Fallani, L.; Catani, J.

    2015-07-15

    In this paper, we present the realization of a compact, high-power laser system able to excite the ytterbium clock transition at 578 nm. Starting from an external-cavity laser based on a quantum dot chip at 1156 nm with an intra-cavity electro-optic modulator, we were able to obtain up to 60 mW of visible light at 578 nm via frequency doubling. The laser is locked with a 500 kHz bandwidth to an ultra-low-expansion glass cavity stabilized at its zero coefficient of thermal expansion temperature through an original thermal insulation and correction system. This laser allowed the observation of the clock transition in fermionic {sup 173}Y b with a <50 Hz linewidth over 5 min, limited only by a residual frequency drift of some 0.1 Hz/s.

  20. Synthesis and bioconjugation of 2 and 3 nm-diameter gold nanoparticles.

    PubMed

    Ackerson, Christopher J; Jadzinsky, Pablo D; Sexton, Jonathan Z; Bushnell, David A; Kornberg, Roger D

    2010-02-17

    By adjustment of solvent conditions for synthesis, virtually monodisperse 4-mercaptobenzoic acid (p-MBA) monolayer-protected gold nanoparticles, 2 and 3 nm in diameter, were obtained. Large single crystals of the 2 nm particles could be grown from the reaction mixture. Uniformity was also demonstrated by the formation of two-dimensional arrays and by quantitative high-angle annular dark-field scanning transmission electron microscopy. The 2 and 3 nm particles were spontaneously reactive for conjugation with proteins and DNA, and further reaction could be prevented by repassivation with glutathione. Conjugates with antibody Fc fragment could be used to identify TAP-tagged proteins of interest in electron micrographs, through the binding of a pair of particles to the pair of protein A domains in the TAP tag. PMID:20099843

  1. A compact ultranarrow high-power laser system for experiments with 578 nm ytterbium clock transition

    NASA Astrophysics Data System (ADS)

    Cappellini, G.; Lombardi, P.; Mancini, M.; Pagano, G.; Pizzocaro, M.; Fallani, L.; Catani, J.

    2015-07-01

    In this paper, we present the realization of a compact, high-power laser system able to excite the ytterbium clock transition at 578 nm. Starting from an external-cavity laser based on a quantum dot chip at 1156 nm with an intra-cavity electro-optic modulator, we were able to obtain up to 60 mW of visible light at 578 nm via frequency doubling. The laser is locked with a 500 kHz bandwidth to an ultra-low-expansion glass cavity stabilized at its zero coefficient of thermal expansion temperature through an original thermal insulation and correction system. This laser allowed the observation of the clock transition in fermionic 173Y b with a <50 Hz linewidth over 5 min, limited only by a residual frequency drift of some 0.1 Hz/s.

  2. Developing multi-layer mirror technology near 45 nm using Sc/Si interfaces

    SciTech Connect

    Nilsen, J; Jankowski, A; Friedman, L; Walton, C C

    2004-02-12

    Given the existing X-ray laser sources near 45 nm it would be useful to produce efficient X-ray optics in the 35 to 50 nm wavelength range that could be utilized in new applications. In this work we are developing the process to stabilize the interfaces of nanolaminate structures using materials such as Sc and Si. These materials will enable us to develop new multi-layer mirror technology that can be used in the wavelength range near 45 nm. To obtain this objective, the interfacial structure and reaction kinetics must first be well understood and then controlled for design applications. In this work we fabricate several Sc/Si multi-layer mirrors with and without a B{sub 4}C barrier layer. The structure and reflectivity of the mirrors are analyzed.

  3. Absolute frequency measurements and hyperfine structures of the molecular iodine transitions at 578 nm

    NASA Astrophysics Data System (ADS)

    Kobayashi, Takumi; Akamatsu, Daisuke; Hosaka, Kazumoto; Inaba, Hajime; Okubo, Sho; Tanabe, Takehiko; Yasuda, Masami; Onae, Atsushi; Hong, Feng-Lei

    2016-04-01

    We report absolute frequency measurements of 81 hyperfine components of the rovibrational transitions of molecular iodine at 578 nm using the second harmonic generation of an 1156-nm external-cavity diode laser and a fiber-based optical frequency comb. The relative uncertainties of the measured absolute frequencies are typically $1.4\\times10^{-11}$. Accurate hyperfine constants of four rovibrational transitions are obtained by fitting the measured hyperfine splittings to a four-term effective Hamiltonian including the electric quadrupole, spin-rotation, tensor spin-spin, and scalar spin-spin interactions. The observed transitions can be good frequency references at 578 nm, and are especially useful for research using atomic ytterbium since the transitions are close to the $^{1}S_{0}-^{3}P_{0}$ clock transition of ytterbium.

  4. Lasing characteristics of Er/sup 3 +/-doped silica fibers from 1553 up to 1603 nm

    SciTech Connect

    Kimura, Y.; Nakazawa, M.

    1988-07-15

    The laser oscillations from 1553 up to 1603 nm have been demonstrated in Er/sup 3 +/-doped silica fibers with a doping rate of 2500 ppm. Wide changes in laser oscillation wavelengths are due to broad splitting of the upper sublevels in the /sup 4/I/sub 152/ manifold, caused by the random structure of the silica matrix. It has been shown that unpumped parts of the Er/sup 3 +/ ions in the end pumped fiber laser configuration play an important role in the wavelength changes of the laser oscillation. For an absorbed pump power of 320 mW at 514 nm, output power of 0.5 mW was obtained at 1603 nm.

  5. Single mode 1018nm fiber laser with power of 230W

    NASA Astrophysics Data System (ADS)

    Glick, Yaakov; Sintov, Yoav; Zuitlin, Roey; Pearl, Shaul; Feldman, Revital; Horvitz, Zvi; Shafir, Noam

    2016-03-01

    We have developed a high power single-mode (SM) monolithic fiber laser at 1018 nm, producing 230 W CW, with an M2 of 1.17 and light to light efficiency of 75%. To the best of our knowledge this is the highest power described in the open literature from a SM fiber laser at this wavelength. Careful simulations were employed which take into account the various wavelength dependent parameters such as the fiber absorption and emission as obtained from the fiber manufacturers, and the cavity mirrors' reflection, in addition to the fiber geometrical parameters. It was found that the major obstacle for increasing the power at 1018nm is the self-generation of amplified spontaneous emission at wavelengths of 1030-1040nm. If the laser is not designed properly these undesired wavelengths dominate the output spectrum.

  6. High-average-power operation of a pulsed Raman fiber amplifier at 1686 nm.

    PubMed

    Yao, Weichao; Chen, Bihui; Zhang, Jianing; Zhao, Yongguang; Chen, Hao; Shen, Deyuan

    2015-05-01

    We report on high-average-power operation of a pulsed Raman fiber amplifier at ~1686 nm which cannot be covered by rare-earth-doped fiber lasers. The Raman fiber amplifier was pumped by a home-made 1565.2 nm Q-switched Er,Yb fiber laser and worked at a repetition frequency of 184 kHz. With 0.8 km Raman fiber, 4.4 W of average output power at the 1st order Stokes wavelength of 1686.5 nm was obtained for launched pump power of 16.2 W, corresponding to an optical-to-optical conversion efficiency of 27.2%. Further increasing the pump power, high-order Stokes waves grew gradually, resulting in a total output power of 6.7 W at the 19.2 W launched pump power. PMID:25969195

  7. Hydroxylapatite nanoparticles obtained by fiber laser-induced fracture

    NASA Astrophysics Data System (ADS)

    Boutinguiza, M.; Lusquiños, F.; Riveiro, A.; Comesaña, R.; Pou, J.

    2009-03-01

    This work presents the results of laser-induced fragmentation of hydroxylapatite microparticles in water dissolution. Calcined fish bones in form of powder, which were previously milled to achieve microsized particles, were used as precursor material. Two different laser sources were employed to reduce the size of the suspended particles: a pulsed Nd:YAG laser and a Ytterbium doped fiber laser working in continuous wave mode. The morphology as well as the composition of the obtained particles was characterized by scanning electron microscopy (SEM), energy dispersive X-ray (EDX) spectroscopy and conventional and high resolution transmission electron microscopy (TEM, HRTEM). The results show that nanometric particles of hydroxylapatite and β-tricalcium phosphate as small as 10 nm diameter can be obtained.

  8. Implications of the temperature dependence of Nd:YAG spectroscopic values for low temperature laser operation at 946 nm

    NASA Astrophysics Data System (ADS)

    Yoon, S. J.; Mackenzie, J. I.

    2014-05-01

    We present our measurements of the key spectroscopic properties over the temperature range of 77 K to 450 K for Nd3+ ions doped in Y3Al5O12 (YAG). From room to liquid nitrogen temperature (LNT), the peak absorption cross section around 808 nm increased by almost 3 times, in conjunction the bandwidth of this absorption line reduced by the same factor. At LNT the peak of the absorption line was blue shifted by 0.25 nm with respect to that at 300 K. The fluorescence spectrum between 850 nm - 1450 nm was measured, from which the emission cross sections for the three main transitions were calculated. One note of particular interest for the dominant emission wavelengths around 1064nm and 1061nm (4F3/2 --> 4I11/2) was the switch in their relative strength below 170K, and at LNT the 1061 nm line has almost twice the cross section as at 1064nm.. The fluorescence and lifetime of the upper laser level (4F3/2) was measured and the effective emission cross section determined by the Fuchtbauer-Ladenburg (F-L) method. The effective emission cross section for 946 nm (R1 --> Z5) increased by more than two times over the 300 K to 77 K range. A numerical fit for the temperature dependent emission cross section at 946 nm and 1064 nm and also calculated absorption coefficient at 808 nm pump diode laser have also obtained from the measured spectroscopic data.

  9. Leaf Level Chlorophyll Fluorescence Emission Spectra: Narrow Band versus Full 650-800 nm Retrievals

    NASA Astrophysics Data System (ADS)

    Middleton, E.; Zhang, Q.; Campbell, P. K.; Huemmrich, K. F.; Corp, L.; Cheng, Y.

    2012-12-01

    Recently, chlorophyll fluorescence (ChlF) retrievals in narrow spectral regions (< 1 nm, between 750-770 nm) of the near infrared (NIR) region of Earth's reflected radiation have been achieved from satellites, including the Japanese GOSAT and the European Space Agency's Sciamachy/Envisat. However, these retrievals sample the total full-spectrum ChlF and are made at non-optimal wavelengths since they are not located at the peak fluorescence emission features. We wish to estimate the total full-spectrum ChlF based on emissions obtained at selected wavelengths. For this, we drew upon leaf emission spectra measured on corn leaves obtained from a USDA experimental cornfield in MD (USA). These emission spectra were determined for the adaxial and abaxial (i.e., top and underside) surfaces of leaves measured throughout the 2008 and 2011 growing seasons (n>400) using a laboratory instrument (Fluorolog-3, Horiba Scientific, USA), recorded in either 1 nm or 5 nm increments with monochromatic excitation wavelengths of either 532 or 420 nm. The total ChlF signal was computed as the area under the continuous spectral emission curves, summing the emission intensities (counts per second) per waveband. The individual narrow (1 or 5 nm) waveband emission intensities were linearly related to full emission values, with variable success across the spectrum. Equations were developed to estimate total ChlF from these individual wavebands. Here, we report the results for the average adaxial/abaxial emissions. Very strong relationships were achieved for the relatively high fluorescence intensities at the red chlorophyll peak, centered at 685 nm (r2= 0.98, RMSE = 5.53 x 107 photons/s) and in the nearby O2-B atmospheric absorption feature centered at 688 nm (r2 = 0.94, RMSE = 4.04 x 107), as well as in the far-red peak centered at 740 nm (r2=0.94, RMSE = 5.98 x107). Very good retrieval success occurred for the O2-A atmospheric absorption feature on the declining NIR shoulder centered at 760

  10. Optical breakdown threshold investigation of 1064 nm laser induced air plasmas

    SciTech Connect

    Thiyagarajan, Magesh; Thompson, Shane

    2012-04-01

    We present the theoretical and experimental measurements and analysis of the optical breakdown threshold for dry air by 1064 nm infrared laser radiation and the significance of the multiphoton and collisional cascade ionization process on the breakdown threshold measurements over pressures range from 10 to 2000 Torr. Theoretical estimates of the breakdown threshold laser intensities and electric fields are obtained using two distinct theories namely multiphoton and collisional cascade ionization theories. The theoretical estimates are validated by experimental measurements and analysis of laser induced breakdown processes in dry air at a wavelength of 1064 nm by focusing 450 mJ max, 6 ns, 75 MW max high-power 1064 nm IR laser radiation onto a 20 {mu}m radius spot size that produces laser intensities up to 3 - 6 TW/cm{sup 2}, sufficient for air ionization over the pressures of interest ranging from 10 to 2000 Torr. Analysis of the measured breakdown threshold laser intensities and electric fields are carried out in relation with classical and quantum theoretical ionization processes, operating pressures. Comparative analysis of the laser air breakdown results at 1064 nm with corresponding results of a shorter laser wavelength (193 nm) [M. Thiyagarajan and J. E. Scharer, IEEE Trans. Plasma Sci. 36, 2512 (2008)] and a longer microwave wavelength (10{sup 8} nm) [A. D. MacDonald, Microwave Breakdown in Gases (Wiley, New York, 1966)]. A universal scaling analysis of the breakdown threshold measurements provided a direct comparison of breakdown threshold values over a wide range of frequencies ranging from microwave to ultraviolet frequencies. Comparison of 1064 nm laser induced effective field intensities for air breakdown measurements with data calculated based on the collisional cascade and multiphoton breakdown theories is used successfully to determine the scaled collisional microwave portion. The measured breakdown threshold of 1064 nm laser intensities are then

  11. Next-generation 193-nm laser for sub-100-nm lithography

    NASA Astrophysics Data System (ADS)

    Duffey, Thomas P.; Blumenstock, Gerry M.; Fleurov, Vladimir B.; Pan, Xiaojiang; Newman, Peter C.; Glatzel, Holger; Watson, Tom A.; Erxmeyer, J.; Kuschnereit, Ralf; Weigl, Bernhard

    2001-09-01

    The next generation 193 nm (ArF) laser has been designed and developed for high-volume production lithography. The NanoLithTM 7000, offering 20 Watts average output power at 4 kHz repetition rates is designed to support the highest exposure tool scan speeds for maximum productivity and wafer throughput. Fundamental design changes made to the laser core technologies are described. These advancements in core technology support the delivery of highly line-narrowed light with

  12. Scattering matrices of martian dust analogs at 488 nm and 647 nm

    NASA Astrophysics Data System (ADS)

    Dabrowska, Dominika D.; Muñoz, Olga; Moreno, Fernando; Ramos, José L.; Martínez-Frías, Jesús; Wurm, Gerhard

    2015-04-01

    We present measurements of the complete scattering matrix as a function of the scattering angle of five martian dust analogs, namely montmorillonite, two palagonite (JSC-1) samples, basalt, and calcite. The measurements are performed at 488 and 647 nm, covering the scattering angle range from 3° to 177°. The experimental scattering matrices are compared with results of Lorenz-Mie calculations performed for the same size distributions and refractive indices as our analog samples. As expected, we find that scattering matrices of realistic polydispersions of dust particles cannot be replaced by such calculated matrices. In contrast, the measured phase functions for our martian dust analogs may be considered a good approximation for martian dust at the studied wavelengths. Further, because of the sensitivity of polarimetry to particle microphysics, spectro-polarimetric observations from the martian surface appear to be a powerful diagnostic tool to infer the composition of the dust in the martian atmosphere. To facilitate the use of the experimental matrices for multiple-scattering calculations with polarization included, we compute the corresponding synthetic scattering matrices based on the measurements and defined in the full angle range from 0° to 180°.

  13. Tailoring 10 nm scale suspended graphene junctions and quantum dots.

    PubMed

    Tayari, Vahid; McRae, Andrew C; Yiğen, Serap; Island, Joshua O; Porter, James M; Champagne, Alexandre R

    2015-01-14

    The possibility to make 10 nm scale, and low-disorder, suspended graphene devices would open up many possibilities to study and make use of strongly coupled quantum electronics, quantum mechanics, and optics. We present a versatile method, based on the electromigration of gold-on-graphene bow-tie bridges, to fabricate low-disorder suspended graphene junctions and quantum dots with lengths ranging from 6 nm up to 55 nm. We control the length of the junctions, and shape of their gold contacts by adjusting the power at which the electromigration process is allowed to avalanche. Using carefully engineered gold contacts and a nonuniform downward electrostatic force, we can controllably tear the width of suspended graphene channels from over 100 nm down to 27 nm. We demonstrate that this lateral confinement creates high-quality suspended quantum dots. This fabrication method could be extended to other two-dimensional materials. PMID:25490053

  14. Methods to achieve sub-100-nm contact hole lithography

    NASA Astrophysics Data System (ADS)

    Lindsay, Tracy K.; Kavanagh, Robert J.; Pohlers, Gerd; Kanno, Takafumi; Bae, Young C.; Barclay, George G.; Kanagasabapathy, Subbareddy; Mattia, Joseph

    2003-06-01

    There are numerous methods being explored by lithographers to achieve contact holes below 100nm. Regarding optical impact on contact hole imaging, very high numerical aperture tools are becoming available at 193nm (as high as 0.9) and various optical extension techniques such as assist features, focus drilling, phase shift masks, and off-axis illumination are being employed to improve the aerial image. In this paper, the impact of the ArF photoresist is investigated. Polymers capable of thermal reflow of larger (~140nm) to smaller (90nm and below) contact holes are presented. Improved materials to achieve the properties necessary for good contact hole imaging for standard single layer resist (SLR) processing are also discussed. State-of-the-art ultra-thin resists (UTR) for contact holes and 193nm bi-layer resist systems are also studied as viable techniques to achieving very small contact holes.

  15. Applications of the 308-nm excimer laser in dermatology

    NASA Astrophysics Data System (ADS)

    Farkas, A.; Kemeny, L.

    2006-05-01

    Excimer lasers contain a mixture of a noble inert gas and a halogen, which form excited dimers only in the activated state. High-energy current is used to produce these dimers, which have a very short lifetime, and after their fast dissociation they release the excitation energy through ultraviolet photons. The application of these lasers proved to be successful in medicine, including the field of ophthalmology, cardiology, angiology, dentistry, orthopaedics, and, in recent years, dermatology. For medical purposes, the 193-nm argon fluoride, the 248-nm krypton fluoride, the 351-nm xenon fluoride, and the 308-nm xenon chloride lasers are used. Recently, the 308-nm xenon chloride laser has gained much attention as a very effective treatment modality in dermatological disorders. It was successfully utilized in psoriasis; later, it proved to be useful in handling other lightsensitive skin disorders and even in the treatment of allergic rhinitis. This review summarizes the possible applications of this promising tool in dermatology.

  16. Long wavelength GaN blue laser (400-490nm) development

    SciTech Connect

    DenBaars, S P; Abare, A; Sink, K; Kozodoy, P; Hansen, M; Bowers, J; Mishra, U; Coldren, L; Meyer, G

    2000-10-26

    Room temperature (RT) pulsed operation of blue nitride based multi-quantum well (MQW) laser diodes grown on c-plane sapphire substrates was achieved. Atmospheric pressure MOCVD was used to grow the active region of the device which consisted of a 10 pair In{sub 0.21}Ga{sub 0.79}N (2.5nm)/In{sub 0.07}Ga{sub 0.93}N (5nm) InGaN MQW. The threshold current density was reduced by a factor of 2 from 10 kA/cm{sup 2} for laser diodes grown on sapphire substrates to 4.8 kA/cm{sub 2} for laser diodes grown on lateral epitaxial overgrowth (LEO) GaN on sapphire. Lasing wavelengths as long as 425nm were obtained. LEDs with emission wavelengths as long as 500nm were obtained by increasing the Indium content. These results show that a reduction in nonradiative recombination from a reduced dislocation density leads to a higher internal quantum efficiency. Further research on GaN based laser diodes is needed to extend the wavelength to 490nm which is required for numerous bio-detection applications. The GaN blue lasers will be used to stimulate fluorescence in special dye molecules when the dyes are attached to specific molecules or microorganisms. Fluorescein is one commonly used dye molecule for chemical and biological warfare agent detection, and its optimal excitation wavelength is 490 nm. InGaN alloys can be used to reach this wavelength.

  17. Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask: II. Experimental results

    NASA Astrophysics Data System (ADS)

    Socha, Robert J.; Shi, Xuelong; Holman, Ken C.; Dusa, Mircea V.; Conley, Will; Petersen, John S.; Chen, J. Fung; Laidig, Thomas L.; Wampler, Kurt E.; Caldwell, Roger F.; Chu, M. C.; Su, Chung Jen; Hung, Kuei-Chun; Chen, C.; Wang, F.; Le, C.; Pierrat, Christophe; Su, Bo

    1999-07-01

    Experiments for 140nm and 160nm contacts were optimized through simulation on an 18 percent transmitting phase shift mask for KrF lithography. A transmission of 18 percent is shown to have the most linear aerial image behavior through focus. The simulations were run using a primitive positive photoresist model in order to predict trends in resolution and to predict when side lobes begin printing. Experiments show that the 140nm and 160nm contact holes resolve without side lobe printing through focus and through exposure. Reticle SEMs verify that a ternary contact hole mask is capable of manufacture. By adding both opaque and clear sub- resolution assist features, the experiments show contacts as small as 140nm resolve with 0.50 micrometers focus latitude with 10 percent exposure latitude through pitch. Cross sectional SEMs verify that contact holes are larger due to the addition of zero order light as suggested by theory and show that side lobes begin to print. Experiments also prove that NA has the largest impact on resolution and exposure latitude and that (sigma) has the largest impact on depth of focus.

  18. 48 CFR 1353.107 - Obtaining forms.

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... 48 Federal Acquisition Regulations System 5 2014-10-01 2014-10-01 false Obtaining forms. 1353.107 Section 1353.107 Federal Acquisition Regulations System DEPARTMENT OF COMMERCE CLAUSES AND FORMS FORMS General 1353.107 Obtaining forms. The DOC forms may be obtained from any DOC contracting office....

  19. 48 CFR 1353.107 - Obtaining forms.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... 48 Federal Acquisition Regulations System 5 2012-10-01 2012-10-01 false Obtaining forms. 1353.107 Section 1353.107 Federal Acquisition Regulations System DEPARTMENT OF COMMERCE CLAUSES AND FORMS FORMS General 1353.107 Obtaining forms. The DOC forms may be obtained from any DOC contracting office....

  20. 48 CFR 1353.107 - Obtaining forms.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... 48 Federal Acquisition Regulations System 5 2010-10-01 2010-10-01 false Obtaining forms. 1353.107 Section 1353.107 Federal Acquisition Regulations System DEPARTMENT OF COMMERCE CLAUSES AND FORMS FORMS General 1353.107 Obtaining forms. The DOC forms may be obtained from any DOC contracting office....

  1. 48 CFR 1353.107 - Obtaining forms.

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... 48 Federal Acquisition Regulations System 5 2011-10-01 2011-10-01 false Obtaining forms. 1353.107 Section 1353.107 Federal Acquisition Regulations System DEPARTMENT OF COMMERCE CLAUSES AND FORMS FORMS General 1353.107 Obtaining forms. The DOC forms may be obtained from any DOC contracting office....

  2. 48 CFR 1353.107 - Obtaining forms.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... 48 Federal Acquisition Regulations System 5 2013-10-01 2013-10-01 false Obtaining forms. 1353.107 Section 1353.107 Federal Acquisition Regulations System DEPARTMENT OF COMMERCE CLAUSES AND FORMS FORMS General 1353.107 Obtaining forms. The DOC forms may be obtained from any DOC contracting office....

  3. Highly reliable 198-nm light source for semiconductor inspection based on dual fiber lasers

    NASA Astrophysics Data System (ADS)

    Imai, Shinichi; Matsuki, Kazuto; Kikuiri, Nobutaka; Takayama, Katsuhiko; Iwase, Osamu; Urata, Yoshiharu; Shinozaki, Tatsuya; Wada, Yoshio; Wada, Satoshi

    2010-02-01

    Highly reliable DUV light sources are required for semiconductor applications such as a photomask inspection. The mask inspection for the advanced devices requires the UV lightning wavelength beyond 200 nm. By use of dual fiber lasers as fundamental light sources and the multi-wavelength conversion we have constructed a light source of 198nm with more than 100 mW. The first laser is Yb doped fiber laser with the wavelength of 1064 nm; the second is Er doped fiber laser with 1560 nm. To obtain the robustness and to simplify the configuration, the fundamental lights are run in the pulsed operation and all wavelength conversions are made in single-pass scheme. The PRFs of more than 2 MHz are chosen as an alternative of a CW light source; such a high PRF light is equivalent to CW light for inspection cameras. The light source is operated described as follows. Automatic weekly maintenance within an hour is done if it is required; automatic monthly maintenance within 4 hours is done on fixed date per month; manufacturer's maintenance is done every 6 month. Now this 198 nm light sources are equipped in the leading edge photomask inspection machines.

  4. O2 absorption cross sections /187-225 nm/ from stratospheric solar flux measurements

    NASA Technical Reports Server (NTRS)

    Herman, J. R.; Mentall, J. E.

    1982-01-01

    The absorption cross sections of molecular oxygen are calculated in the wavelength range from 187 to 230 nm from solar flux measurements obtained within the stratosphere. Within the Herzberg continuum wavelength region the molecular oxygen cross sections are found to be about 30% smaller than the laboratory results of Shardanand and Rao (1977) from 200 to 210 nm and about 50% smaller than those of Hasson and Nicholls (1971). At wavelengths longer than 210 nm the cross sections agree with those of Shardanand and Rao. The effective absorption cross sections of O2 in the Schumann-Runge band region from 187 to 200 nm are calculated and compared to the empirical fit given by Allen and Frederick (1982). The calculated cross sections indicate that the transmissivity of the atmosphere may be underestimated by the use of the Allen and Frederic cross sections between 195 and 200 nm. The ozone column content between 30 and 40 km and the relative ozone cross sections are determined from the same solar flux data set.

  5. Continuous-wave single-frequency laser with dual wavelength at 1064 and 532 nm.

    PubMed

    Zhang, Chenwei; Lu, Huadong; Yin, Qiwei; Su, Jing

    2014-10-01

    A continuous-wave high-power single-frequency laser with dual-wavelength output at 1064 and 532 nm is presented. The dependencies of the output power on the transmission of the output coupler and the phase-matching temperature of the LiB(3)O(5) (LBO) crystal are studied. An output coupler with transmission of 19% is used, and the temperature of LBO is controlled to the optimal phase-matching temperature of 422 K; measured maximal output powers of 33.7 W at 1064 nm and of 1.13 W at 532 nm are obtained with optical-optical conversion efficiency of 45.6%. The laser can be single-frequency operated stably and mode-hop-free, and the measured frequency drift is less than 15 MHz in 1 min. The measured Mx2 and My2 for the 1064 nm laser are 1.06 and 1.09, respectively. The measured Mx2 and My2 for the 532 nm laser are 1.12 and 1.11, respectively. PMID:25322220

  6. Nonlinear optical properties of Bi2O3-GeO2 glass at 800 and 532 nm

    NASA Astrophysics Data System (ADS)

    Oliveira, Tâmara R.; Falcão-Filho, Edilson L.; de Araújo, Cid B.; da Silva, Diego S.; Kassab, Luciana R. P.; da Silva, Davinson M.

    2013-08-01

    The nonlinear (NL) optical properties of glassy xBi2O3-(1-x) GeO2 with x = 0.72 and 0.82 were investigated. The experiments were performed with lasers at 800 nm (pulses of 150 fs) and 532 nm (pulses of 80 ps and 250 ns). Using the Kerr gate technique, we observed that the NL response of the samples at 800 nm is faster than 150 fs. NL refraction indices, |n2|≈ 5 × 10-16 cm2/W, and two-photon absorption coefficients, α2, smaller than 0.03 cm/GW, were measured at 800 nm. At 532 nm, we measured the NL transmittance of the samples. From the results obtained, we determined α2 ≈1 cm/GW and excited-state absorption cross-sections of ≈10-22 cm2 due to free-carriers.

  7. 504 nm blue-green laser based on sum-frequency mixing of diode pumped Nd3+ lasers

    NASA Astrophysics Data System (ADS)

    Wu, Y.; Jin, G. Y.; Dong, Y.

    2011-08-01

    We report for the first time a continuous-wave (CW) blue-green radiation at 504 nm by intracavity sum-frequency generation of 946 nm Nd:YAG laser and 1080 nm Nd:YAlO3 (Nd:YAP) laser. Using type-I critical phase matching LiB3O5 (LBO) crystal, 504 nm blue-green laser was obtained by 946 and 1080 nm intra-cavity sum-frequency mixing, and output power of 215 mW was demonstrated. At the output power level of 215 mW, the output power stability is better than 4.7% and laser beam quality M2 factor is 1.21.

  8. Cavity-enhanced frequency doubling from 795nm to 397.5nm ultra-violet coherent radiation with PPKTP crystals in the low pump power regime.

    PubMed

    Wen, Xin; Han, Yashuai; Bai, Jiandong; He, Jun; Wang, Yanhua; Yang, Baodong; Wang, Junmin

    2014-12-29

    We demonstrate a simple, compact and cost-efficient diode laser pumped frequency doubling system at 795 nm in the low power regime. In two configurations, a bow-tie four-mirror ring enhancement cavity with a PPKTP crystal inside and a semi-monolithic PPKTP enhancement cavity, we obtain 397.5nm ultra-violet coherent radiation of 35mW and 47mW respectively with a mode-matched fundamental power of about 110mW, corresponding to a conversion efficiency of 32% and 41%. The low loss semi-monolithic cavity leads to the better results. The constructed ultra-violet coherent radiation has good power stability and beam quality, and the system has huge potential in quantum optics and cold atom physics. PMID:25607194

  9. Wavelength dependence on the forensic analysis of glass by nanosecond 266 nm and 1064 nm laser induced breakdown spectroscopy

    SciTech Connect

    Cahoon, Erica M.; Almirall, Jose R.

    2010-05-01

    Laser induced breakdown spectroscopy can be used for the chemical characterization of glass to provide evidence of an association between a fragment found at a crime scene to a source of glass of known origin. Two different laser irradiances, 266 nm and 1064 nm, were used to conduct qualitative and quantitative analysis of glass standards. Single-pulse and double-pulse configurations and lens-to-sample-distance settings were optimized to yield the best laser-glass coupling. Laser energy and acquisition timing delays were also optimized to result in the highest signal-to-noise ratio corresponding to the highest precision and accuracy. The crater morphology was examined and the mass removed was calculated for both the 266 nm and 1064 nm irradiations. The analytical figures of merit suggest that the 266 nm and 1064 nm wavelengths are capable of good performance for the forensic chemical characterization of glass. The results presented here suggest that the 266 nm laser produces a better laser-glass matrix coupling, resulting in a better stoichiometric representation of the glass sample. The 266 nm irradiance is therefore recommended for the forensic analysis and comparison of glass samples.

  10. 1064 nm laser emission of highly doped Nd: Yttrium aluminum garnet under 885 nm diode laser pumping

    NASA Astrophysics Data System (ADS)

    Lupei, V.; Pavel, N.; Taira, T.

    2002-06-01

    Highly efficient 1064 nm continuous-wave laser emission under 885 nm diode pumping in concentrated Nd: Yttrium aluminum garnet (YAG) crystals (up to 3.5 at. % Nd) and ceramics (up to 3.8 at. % Nd) is reported. A highly doped (2.4 at. %) Nd:YAG laser, passively Q switched by a Cr4+:YAG saturable absorber, is demonstrated.

  11. Resolution of 5.4 nm from a Photoemission Electron Microscope Corrected with an Electrostatic Mirror

    NASA Astrophysics Data System (ADS)

    Word, R. C.; Rempfer, G. F.; Almaraz, L.; Dixon, T.; Konenkamp, R.

    2010-03-01

    We report resolution of 5.4 +/- 0.5 nm for a photoemission electron microscope (PEEM) that employs an electrostatic mirror that simultaneously corrects chromatic and spherical aberration. This is a marked improvement over the 8 to 10nm resolution obtained by uncorrected PEEMs, which suffer particularly from chromatic aberration resulting from the acceleration of low energy photoelectrons from the specimen surface. The resolution was obtained in a biological application using sarcoplasmic reticulum from skeletal muscle as a specimen. The sample was deposited on a low photoemission substrate of chromium-coated glass and illuminated with UV light from a 100-mW 244-nm Ar laser. Resolution was determined using the 0.1 to 0.9 contrast change in intensity line profiles as well as by a 2-dimensional Fast Fourier Transform method. The PEEM employs a Y-branched beam separator, three deflection magnets, and twelve electrostatic lenses all heavily filtered to suppress voltage instabilities. Spherical and chromatic aberration coefficients were determined by computer modeling and in-situ experiments to be 1 cm. Once the instrument is perfected, the resolution should be 2 nm.

  12. An RGD spacing of 440 nm is sufficient for integrin alpha V beta 3- mediated fibroblast spreading and 140 nm for focal contact and stress fiber formation

    PubMed Central

    1991-01-01

    The synthetic peptide Gly-Arg-Gly-Asp-Tyr (GRGDY), which contains the RGD sequence of several adhesion molecules, was covalently grafted to the surface of otherwise poorly adhesive glass substrates and was used to determine the minimal number of ligand-receptor interactions required for complete spreading of human foreskin fibroblasts. Well- defined adhesion substrates were prepared with GRGDY between 10(-3) fmol/cm2 and 10(4) fmol/cm2. As the adhesion ligand surface concentration was varied, several distinct morphologies of adherent cells were observed and categorized. The population of fully spread cells at 4 h reached a maximum at 1 fmol/cm2, with no further increases up to 10(4) fmol/cm2. Although maximal cell spreading was obtained at 1 fmol/cm2, focal contacts and stress fibers failed to form at RGD surface concentrations below 10 fmol/cm2. The minimal peptide spacings obtained in this work correspond to 440 nm for spreading and 140 nm for focal contact formation, and are much larger than those reported in previous studies with adsorbed adhesion proteins, adsorbed RGD-albumin conjugates, or peptide-grafted polyacrylamide gels. Vitronectin receptor antiserum specific for integrin alpha V beta 3 blocked cell adhesion and spreading on substrates containing 100 fmol/cm2 of surface- bound GRGDY, while fibronectin receptor antiserum specific for alpha 5 beta 1 did not. Furthermore, alpha V beta 3 was observed to cluster into focal contacts in spread cells, but alpha 5 beta 1 did not. It was thus concluded that a peptide-to-peptide spacing of 440 nm was required for alpha V beta 3-mediated cellular spreading, while 140 nm was required for alpha V beta 3-mediated focal contact formation and normal stress fiber organization in human foreskin fibroblasts; these spacings represent much fewer ligands than were previously thought to be required. PMID:1714913

  13. induced by 1,540-nm laser excitation

    NASA Astrophysics Data System (ADS)

    Zheng, J.; Wang, X. F.; He, W. Y.; Bu, Y. Y.; Yan, X. H.

    2014-06-01

    The multi-photon ultraviolet upconversion emission properties and synergistic effect are investigated in BaSr2Y6O12:Er3+ phosphor. The deep-ultraviolet emissions centered at 274, 297 and 324-nm are observed under the 1,540-nm excitation, which results from a seven-, six- and six-photon upconversion process, respectively. A synergistic effect is found, which shows that the red emission intensity under 351- and 1,540-nm dual excitation is 4.7 % time stronger than the sum of red emission intensities under the 351 and 1,540-nm single excitation. This phenomenon is attributed to the 4I13/2 and 4I11/2 levels of Er3+ from non-radiative transition process under the 351-nm excitation are excited again to 4F9/2 level by absorbing 1,540-nm photon in the 351- and 1,540-nm dual-excitation process.

  14. 500.5-nm blue-green laser based on sum-frequency mixing of diode pumped neodymium lasers

    NASA Astrophysics Data System (ADS)

    Wang, S. F.; Na, Y. X.

    2011-07-01

    We report for the first time a continuous-wave (CW) coherent radiation at 500.5 nm by intracavity sum-frequency generation of 1063 nm Nd:GdVO4 laser and 946 nm Nd:YAG laser. Blue-green laser is obtained by using a doubly cavity, type-II critical phase matching KTiOPO4 (KTP) crystal sum-frequency mixing. With total pump power of 27.8 W, TEM00 mode blue-green laser at 500.5 nm of 421 mW is obtained. At the output power level of 421 mW, the blue-green power stability is better than 2.8% and laser beam quality M 2 factor is 1.37.

  15. Study of 193-nm resist degradation under various etch chemistries

    NASA Astrophysics Data System (ADS)

    Bazin, Arnaud; May, Michael; Pargon, Erwine; Mortini, Benedicte; Joubert, Olivier

    2007-03-01

    The effectivity of 193nm photoresists as dry etch masks is becoming more and more critical as the size of integrated devices shrinks. 193nm resists are known to be much less resistant to dry etching than 248nm resists based on a poly(hydroxystyrene) polymer backbone. The decrease in the resist film budget implies a better etch resistance to use single layer 193nm photoresists for the 65nm node and beyond. In spite of significant improvements made in the past decade regarding the etch resistance of photoresists, much of the fundamental chemistry and physics that could explain the behaviour of these materials has to be better understood. Such knowledge is necessary in order to propose materials and etch processes for the next technology nodes (45nm and below). In this paper, we report our studies on the etch behaviour of different 193nm resist materials as a function of etch chemistry. In a first step, we focus our attention on the interactions between photoresists and the reactive species of a plasma during a dry etch step. Etch experiments were carried out in a DPS (Decoupled Plasma Source) high density chamber. The gas chemistry in particular was changed to check the role of the plasma reactive species on the resist. O II, Cl II, CF 4, HBr and Ar gas were used. Etch rates and chemical modifications of different materials were quantified by ellipsometry, Fourier Transformed Infrared Spectroscopy (FTIR), and X-Ray Photoelectrons Spectroscopy (XPS). We evaluated different materials including 248nm model polymer backbones (pure PHS or functionalized PHS), and 193nm model polymers (PMMA and acrylate polymers) or resist formulations. Besides the influence of resist chemistry, the impact of plasma parameters was addressed.

  16. 180W at 1kHz, 532nm SHG from LBO crystals using high average power Nd:YAG laser

    NASA Astrophysics Data System (ADS)

    Tamaoki, Yoshinori; Kato, Yoshinori; Iyama, Koichi; Kawashima, Toshiyuki; Miyanaga, Noriaki

    2014-02-01

    We have developed high average power MOPA laser system with SHG unit on the table top size (3 × 1.5m). At the wavelength 1064nm has been obtained the max average output power of 715W. We have achieved the average power 180W at the wavelength 532nm, the pulse width of about 100ns, the frequency of 1kHz. And the power efficiency of the SHG from the wavelength of 1064nm to 532nm was obtained about 25.6%.

  17. Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2

    NASA Astrophysics Data System (ADS)

    Mimotogi, Shoji; Uesawa, Fumikatsu; Tominaga, Makoto; Fujise, Hiroharu; Sho, Koutaro; Katsumata, Mikio; Hane, Hiroki; Ikegami, Atsushi; Nagahara, Seiji; Ema, Tatsuhiko; Asano, Masafumi; Kanai, Hideki; Kimura, Taiki; Iwai, Masaaki

    2007-03-01

    Immersion lithography was applied to 45nm node logic and 0.25um2 ultra-high density SRAM. The predictable enhancement of focus margin and resolution were obtained for all levels which were exposed by immersion tool. In particular, the immersion lithography enabled to apply the attenuating phase shift mask to the gate level. The enough lithography margin for the alternating phase shift mask was also obtained by using not only immersion tool but also dry tool for gate level. The immersion lithography shrunk the minimum hole pitch from 160nm to 140nm. Thus, the design rule for 45nm node became available by using immersion lithography.

  18. Analysis of Optogalvanic Transients at 621.7 nm, 633.4 nm and 640.2 nm of Neon in a Discharge Plasma Fitted with a Monte Carlo Mathematical Model.

    NASA Astrophysics Data System (ADS)

    Ogungbemi, Kayode; Han, Xianming; Blosser, Micheal; Misra, Prabhakar; LASER Spectroscopy Group Collaboration

    2014-03-01

    Optogalvanic transitions have been recorded and fitted for 1s5 - 2p7\\ (621.7 nm), 1s5 - 2p8 (633.4 nm) and 1s5 - 2p9 (640.2 nm) transitions of neon in a Fe-Ne hollow cathode plasma discharge as a function of current (2-19 mA) and time evolution (0-50 microsec). The optogalvanic waveforms have been fitted to a Monte carlo mathematical model. The variation in the excited population of neon is governed by the rate of collision of the atoms involving the common metastable state (1s5) for the three transitions investigated. The concomitant changes in amplitudes and intensities of the optogalvanic signal waveforms associated with these transitions have been studied rigorously and the fitted parameters obtained using the Monte Carlo algorithm to help better understand the physics of the hollow cathode discharge. Thanks to Laser Spectroscopy group in Physics and Astronomy Dept. Howard University Washington DC.

  19. Sub-100 nm patterning of supported bilayers by nanoshaving lithography.

    PubMed

    Shi, Jinjun; Chen, Jixin; Cremer, Paul S

    2008-03-01

    Sub-100 nm wide supported phospholipid bilayers (SLBs) were patterned on a planar borosilicate substrate by AFM-based nanoshaving lithography. First, a bovine serum albumin monolayer was coated on the glass and then selectively removed in long strips by an AFM tip. The width of vacant strips could be controlled down to 15 nm. Bilayer lines could be formed within the vacant strips by vesicle fusion. It was found that stable bilayers formed by this method had a lower size limit of approximately 55 nm in width. This size limit stems from a balance between a favorable bilayer adhesion energy and an unfavorable bilayer edge energy. PMID:18257567

  20. 80 nm tunable DBR-free semiconductor disk laser

    NASA Astrophysics Data System (ADS)

    Yang, Z.; Albrecht, A. R.; Cederberg, J. G.; Sheik-Bahae, M.

    2016-07-01

    We report a widely tunable optically pumped distributed Bragg reflector (DBR)-free semiconductor disk laser with 6 W continuous wave output power near 1055 nm when using a 2% output coupler. Using only high reflecting mirrors, the lasing wavelength is centered at 1034 nm and can be tuned up to a record 80 nm by using a birefringent filter. We attribute such wide tunability to the unique broad effective gain bandwidth of DBR-free semiconductor disk lasers achieved by eliminating the active mirror geometry.

  1. All-fibre ytterbium laser tunable within 45 nm

    SciTech Connect

    Abdullina, S R; Babin, S A; Vlasov, A A; Kablukov, S I; Shelemba, I S; Kurkov, A S

    2007-12-31

    A tunable ytterbium-doped fibre laser is fabricated. The laser is tuned by using a tunable fibre Bragg grating (FBG) as a selecting intracavity element. The laser is tunable within 45 nm (from 1063 to 1108 nm) and emits {approx}6 W in the line of width {approx}0.15 nm, the output power and linewidth being virtually invariable within the tuning range. The method is proposed for synchronous tuning the highly reflecting and output FBGs, and a tunable ytterbium all-fibre laser is built. (lasers)

  2. Absorption coefficients and band strengths for the 703 nm and 727 bands of methane at 77 K

    SciTech Connect

    O`Brien, J.J.; Singh, K.

    1996-12-31

    The technique of intracavity laser spectroscopy has been used to obtain methane absorption spectra for the vibrational overtone bands that occur around 703 nm and 727 nm. Absorption coefficients for the 690-742 nm range have been obtained for a sample temperature of 77 K at a spectral resolution of <0.02 cm{sup -1}. A new method of data analysis is utilized in obtaining the results. It involves deconvolving the many ILS spectral profiles that comprise the absorption bands and summing the results. Values averaged over 1 cm{sup -1} and 1 {Angstrom} intervals are provided. Band strengths also are obtained. The total intensities of the 703 and 727 nm bands are in reasonable agreement with previous laboratory determinations which were obtained for relatively high pressures of methane at room temperature using lower spectral resolution. The methane bands appear in the reflected sunlight spectra from the outer planets. Results averaged over 1 nm intervals are compared with other laboratory studies and with those derived from observations of the outer planets. The band profiles differ considerably from other laboratory results but are in good accord with the planetary observations. Laboratory spectra of methane at appropriate conditions are required for the proper interpretation of the observational data. Absorption spectra can provide some of the most sensitive diagnostic data on the atmospheres of those bodies.

  3. Ytterbium-doped fibre laser tunable in the range 1017 - 1040 nm with second-harmonic generation

    SciTech Connect

    Dontsova, E I; Kablukov, S I; Babin, Sergei A

    2013-05-31

    A cladding-pumped ytterbium-doped fibre laser has been tuned to shorter emission wavelengths (from 1040 to 1017 nm). The laser output power obtained has been compared to calculation results. We have studied frequency doubling of the laser in a KTiOPO{sub 4} (KTP) crystal with type II phase matching in the XY plane and demonstrated wavelength tuning in the range 510 - 520 nm. (lasers)

  4. 240 kW peak power at 266 nm in nonlinear YAl3(BO3)4 single crystal.

    PubMed

    Ilas, Simon; Loiseau, Pascal; Aka, Gérard; Taira, Takunori

    2014-12-01

    We report the fourth harmonic generation at 266 nm using a type I YAl3(BO3)4 (YAB) single crystal from a Q-switch microchip laser Nd:YAG/Cr⁴⁺:YAG frequency doubled with a LiB3O5 (LBO) crystal. 240 kW peak power at 266 nm corresponding to a mean conversion efficiency of 12.2% from 532 to 266 nm has been obtained with a 2.94 mm thick YAB crystal. The influences of optical homogeneity and absorption on the conversion efficiency are discussed. PMID:25606961

  5. Laser induced fluorescence (LIF) of Hg2 and Hg3 via dissociation of HgBr2 at 157 nm

    NASA Astrophysics Data System (ADS)

    Skordoulis, C.; Sarantopoulou, E.; Spyrou, S. M.; Kosmidis, C.; Cefalas, A. C.

    1991-06-01

    Laser induced fluorescence of the mercury clusters Hg2 and Hg3 in the spectral range between 300 nm to 510 nm has been obtained from the dissociation of HgBr2 at 7.88 eV (157.5 nm) with an F2 molecular laser, together with fluorescence from mercury atomic transitions from highly excited states. The excitation process involves two photon absorption which dissociates the molecule at 15.76 eV total photon energy with the subsequent formation of the metallic clusters.

  6. QCW diode-side-pumped Nd:YAG ceramic laser with 247 W output power at 1123 nm

    NASA Astrophysics Data System (ADS)

    Li, C. Y.; Peng, Q. J.; Wang, B. S.; Bo, Y.; Cui, D. F.; Xu, Z. Y.; Feng, X. Q.; Pan, Y. B.

    2011-05-01

    We demonstrate for the first time a diode-side-pumped quasi-continuous-wave (QCW) operation of a 1123 nm Nd:YAG ceramic laser. The single 1123 nm wavelength is acquired through precise coating. With a pump power of 1000 W, an output power of 247 W is obtained, corresponding to an optical-optical conversion efficiency of 24.7%. At the maximal output power, the pulse repetition rate and pulse width are measured to be 1.1 kHz and 180 μs, respectively. The numerical simulations for wavelength selectivity from 1112, 1116 and 1123 nm are discussed in detail.

  7. Development of high coherence, 200mW, 193nm solid-state laser at 6 kHz

    NASA Astrophysics Data System (ADS)

    Nakazato, T.; Tsuboi, M.; Onose, T.; Tanaka, Y.; Sarukura, N.; Ito, S.; Kakizaki, K.; Watanabe, S.

    2015-02-01

    The high coherent, high power 193-nm ArF lasers are useful for interference lithography and microprosessing applications. In order to achieve high coherence ArF lasers, we have been developing a high coherence 193 nm solid state laser for the seeding to a high power ArF laser. We used the sum frequency mixing of the fourth harmonic (FH) of a 904-nm Ti:sapphire laser with a Nd:YVO4 laser (1342 nm) to generate 193-nm light. The laser system consists of a single-mode Ti:sapphire oscillator seeded by a 904-nm external cavity laser diode, a Pockels cell, a 6-pass amplifier, a 4-pass amplifier, a 2-pass amplifier and a wavelength conversion stage. The required repetition rate of 6 kHz corresponding to the ArF laser, along with a low gain at 904 nm induces serious thermal lens effects; extremely short focal lengths of the order of cm and bi-foci in the vertical and horizontal directions. From the analysis of thermal lens depending on pump intensity, we successfully compensated the thermal lens by dividing a 527-nm pump power with 15, 25 and 28 W to 3-stage amplifiers with even passes, resulting in the output power above 10W with a nearly diffraction limited beam. This 904-nm output was converted to 3.8 W in the second harmonic by LBO, 0.5 W in FH by BBO sequentially. Finally the output power of 230 mW was obtained at 193 nm by mixing the FH with a 1342-nm light in CLBO.

  8. Imaging the internal structure of the guinea pig cochlea using optical coherence tomography at 1310 nm

    NASA Astrophysics Data System (ADS)

    Yamaguchi, Mark K.; de Boer, Johannes F.; Park, Boris H.; Nassif, Nader; Zhao, Yonghua; Chen, Zhongping; Wong, Brian J.

    2001-05-01

    Optical coherence tomography (OCT) was used to obtain cross sectional images of the internal structure of the cochlea in guinea pigs following sacrifice. The 1310 nm source (bandwidth (lambda) equals75 nm) allowed a penetration depth of approximately 1.5 mm. Cross-sectional images (1.87 x 2.00 mm, 10 x 10 micrometers /pixel) were acquired at a frame rate of 1 Hz. Access to the middle ear space was obtained by removing the mastoid bulla. Imaging was performed in situ and also in ex vivo temporal bones. The scala vestibuli, scala media, scala tympani, modiolus and all four and a half turns of the cochlea were identified. These images demonstrate the potential value of OCT for use in determining the internal structures of the cochlea with near-microscopic resolution and at near-real time frame rates.

  9. Analysis of excited-state Faraday anomalous dispersion optical filter at 1529 nm.

    PubMed

    Xiong, Junyu; Yin, Longfei; Luo, Bin; Guo, Hong

    2016-06-27

    In this work, a detailed theoretical analysis of 1529 nm ES-FADOF (excited state Faraday anomalous dispersion optical filter) based on rubidium atoms pumped by 780 nm laser is introduced, where Zeeman splitting, Doppler broadening, and relaxation processes are considered. Experimental results are carefully compared with the derivation. The results prove that the optimal pumping frequency is affected by the working magnetic field. The population distribution among all hyperfine Zeeman sublevels under the optimal pumping frequency has also been obtained, which shows that 85Rb atoms are the main contribution to the population. The peak transmittance above 90% is obtained, which is in accordance with the experiment. The calculation also shows that the asymmetric spectra observed in the experiment are caused by the unbalanced population distribution among Zeeman sublevels. This theoretical model can be used for all kinds of calculations for FADOF. PMID:27410643

  10. SOFIA Observatory Obtains 'First Light' Images

    NASA Video Gallery

    NASA's Stratospheric Observatory for Infrared Astronomy, or SOFIA, successfully obtained its "First Light"" images during an overnight flight May 26. Scientists are now processing the data gathered...

  11. Removal of copper oxide from copper surfaces using Q-switched Nd:YAG radiation at 1064 nm, 532 nm, and 266 nm

    NASA Astrophysics Data System (ADS)

    Kearns, Aileen; Fischer, C.; Watkins, Kenneth G.; Glasmacher, Mathias; Steen, William M.; Kheyrandish, H.; Brown, A.

    1997-08-01

    During electronic device fabrication it is necessary to remove the oxides from copper surfaces prior to soldering in order to improve the surface wetability and achieve a good quality solder joint. The usual method of achieving this is by using acids in a flux. The work reported here explores the possibility of removing these oxides by laser cleaning using the harmonics of a Q-switched Nd:YAG laser, a technique which could be incorporated into a industrial laser soldering process. The effect of Q-switched Nd:YAG radiation (5 - 10 ns pulses), at 1064 nm, 532 nm and 266 nm, on the oxidized surface of a copper alloy foil is studied with increasing fluence. In order to successfully compare the effect of increasing fluence at the three wavelengths each area treated was only subjected to one laser pulse. The laser treated surfaces were characterized using optical microscopy, SEM, and surface analysis performed by static secondary ion mass spectrometry (SSIMS). SSIMS and SNMS (secondary neutral mass spectrometry) with mechanical depth profilometry were used to characterize the oxide layer. The reflectivity of the oxidized plates for the three wavelengths was ascertained using a reflectivity spectrometer. Successful cleaning was achieved at all wavelengths, above certain threshold values which defined the lower end of the process operating window for single pulse operation. The threshold for the cleaning process decreased with laser wavelength. Surface melting was evident at the lowest fluences examined for all the wavelengths (< .5 J/cm2). This value is well below the lower end of the process windows of all wavelengths. Microscopic `explosive' features were found at the onset of copper oxide removal possibly resulting from ionization or a plasma induced shock waves. There was some possible evidence of mechanical effects at 1064 nm and 532 nm. Large amounts of sputtered debris was found around the 266 nm craters. A SSIMS analysis was performed on the 532 nm spots. The

  12. Metastasis suppressors Nm23H1 and Nm23H2 differentially regulate neoplastic transformation and tumorigenesis.

    PubMed

    Tong, Yao; Yung, Lisa Y; Wong, Yung H

    2015-06-01

    Nm23H1 and H2 are prototypical metastasis suppressors with diverse functions, but recent studies suggest that they may also regulate tumorigenesis. Here, we employed both cellular and in vivo assays to examine the effect of Nm23H1 and H2 on tumorigenesis induced by oncogenic Ras and/or p53 deficiency. Co-expression of Nm23H1 but not H2 in NIH3T3 cells effectively suppressed neoplastic transformation and tumorigenesis induced by the oncogenic H-Ras G12V mutant. Overexpression of Nm23H1 but not H2 also inhibited tumorigenesis by human cervical cancer HeLa cells with p53 deficiency. However, in human non-small-cell lung carcinoma H1299 cells harboring N-Ras Q61K oncogenic mutation and p53 deletion, overexpression of Nm23H1 did not affect tumorigenesis in nude mice assays, while overexpression of Nm23H2 enhanced tumor growth with elevated expression of the c-Myc proto-oncogene. Collectively, these results suggest that Nm23H1 and H2 have differential abilities to modulate tumorigenesis. PMID:25748386

  13. Photodissociation dynamics of 2-nitropropane and 2-methyl-2-nitropropane at 248 and 193 nm.

    PubMed

    Sengupta, Sumana; Indulkar, Yogesh; Kumar, Awadhesh; Dhanya, Suresh; Naik, Prakash Dattatray; Bajaj, Parma Nand

    2008-12-11

    Dynamics of formation of electronically excited NO2 and formation of OH fragment, during photo dissociation of 2-nitropropane (NP) and 2-methyl-2-nitropropane (MNP), were investigated at 193 and 248 nm. The radiative lifetime of the electronically excited NO2 fragment, observed at 193 nm, was measured to be 1.2 ( 0.1 micros and the rate coefficient of quenching of its emission by MNP was measured as (2.7 ( 0.1) x 10(-10) molecule(-1) cm3 s(-1). Formation of the ground electronic state of OH was confirmed in both molecules. State selective laser induced fluorescence technique was used to detect the nascent OH (X 2Pi, v'', J'') fragments in different ro-vibrational states, and to obtain information on energy partitioning. Though MNP and NP differ in the types of the available H atoms, the dynamics of OH formation is found to be the same in both. The relative population in different rotational states does not follow Boltzmann equilibrium distribution in both the molecules at 193 and 248 nm. The translational energies of the OH fragments, calculated from the Doppler width, are 21.2 ( 7.2 and 25.0 ( 2.5 kcal mol-1 for NP at 248 and 193 nm, respectively. The translational energies of the OH fragments, in the case of MNP, are found to be lower, 17.5 ( 4.1 and 22.0 ( 3.2 kcal mol-1,respectively, at 248 nm 193 nm. These results are compared with the earlier reports on photodissociation of nitromethane (NM), nitroethane (NE), and other nitroalkanes. All possible dissociation pathways of these molecules--NM, NE, NP, and MNPs leading to the formation of the OH fragment were investigated computationally, with geometry optimization at the B3LYP/6-311+G(d,p) level and energy calculation at the MP4(SDQ)/6-311+G (d,p) level. The results suggest that in NM, OH is formed after isomerization to CH2N(OH)O, whereas in all other cases OH is formed from HONO, a primary product of molecular elimination of nitroalkanes, formed with sufficient internal energy. PMID:19053556

  14. Compact frequency-quadrupled pulsed 1030nm fiber laser

    NASA Astrophysics Data System (ADS)

    McIntosh, Chris; Goldberg, Lew; Cole, Brian; DiLazaro, Tom; Hays, Alan D.

    2016-03-01

    A compact 1030nm fiber laser for ultraviolet generation at 257.5nm is presented. The laser employs a short length of highly-doped, large core (20μm), coiled polarization-maintaining ytterbium-doped double-clad fiber pumped by a wavelength-stabilized 975nm diode. It is passively Q-switched via a Cr4+:YAG saturable absorber and generates 2.4W at 1030nm in a 110μJ pulse train. Lithium triborate (LBO) and beta-barium borate (BBO) are used to achieve 325mW average power at the fourth harmonic. The laser's small form factor, narrow linewidth and modest power consumption are suitable for use in a man-portable ultraviolet Raman explosives detection system.

  15. Photorefractive effect at 775 nm in doped lithium niobate crystals

    SciTech Connect

    Nava, G.; Minzioni, P.; Cristiani, I.; Degiorgio, V.; Argiolas, N.; Bazzan, M.; Ciampolillo, M. V.; Pozza, G.; Sada, C.

    2013-07-15

    The photorefractive effect induced by 775-nm laser light on doped lithium niobate crystals is investigated by the direct observation in the far field of the transmitted-beam distortion as a function of time. Measurements performed at various Zr-doping concentrations and different light intensities show that the 775-nm light beam induces a steady-state photorefractive effect comparable to that of 532-nm light, but the observed build-up time of the photovoltaic field is longer by three-orders of magnitude. The 775-nm photorefractivity of lithium niobate crystals doped with 3 mol. % ZrO{sub 2} or with 5.5 mol. % MgO is found to be negligible.

  16. 100-nm node lithography with KrF?

    NASA Astrophysics Data System (ADS)

    Fritze, Michael; Tyrrell, Brian; Astolfi, David K.; Yost, Donna; Davis, Paul; Wheeler, Bruce; Mallen, Renee D.; Jarmolowicz, J.; Cann, Susan G.; Liu, Hua-Yu; Ma, M.; Chan, David Y.; Rhyins, Peter D.; Carney, Chris; Ferri, John E.; Blachowicz, B. A.

    2001-09-01

    We present results looking into the feasibility of 100-nm Node imaging using KrF, 248-nm, exposure technology. This possibility is not currently envisioned by the 1999 ITRS Roadmap which lists 5 possible options for this 2005 Node, not including KrF. We show that double-exposure strong phase- shift, combined with two mask OPC, is capable of correcting the significant proximity effects present for 100-nm Node imaging at these low k1 factors. We also introduce a new PSM Paradigm, dubbed 'GRATEFUL,' that can image aggressive 100-nm Node features without using OPC. This is achieved by utilizing an optimized 'dense-only' imaging approach. The method also allows the re-use of a single PSM for multiple levels and designs, thus addressing the mask cost and turnaround time issues of concern in PSM technology.

  17. Absolute measurement of F2-laser power at 157 nm

    SciTech Connect

    Kueck, Stefan; Brandt, Friedhelm; Kremling, Hans-Albert; Gottwald, Alexander; Hoehl, Arne; Richter, Mathias

    2006-05-10

    We report a comparison of laser power measurements at the F2-laser wavelength oaf nm made at two facilities of the Physikalisch-Technische Bundesanstalt (PTB), the German national metrology institute. At the PTB laboratory at the electron storage ring BESSY II in Berlin, the scale for laser power was directly traced to a cryogenic radiometer operating at 157 nm, whereas at the PTB laser radiometry facility in Braunschweig the calibration of transfer detectors was performed with a newly developed standard for laser power at 157 nm, which is traceable in several steps to a cryogenic radiometer operating at 633 nm. The comparison was performed under vacuum conditions with laser pulse energies of?10 {mu}J, however with different average powers because different primary standard radiometers were used. The relative deviation for the responsivity of the transfer detector was 4.8% and thus within the combined standard uncertainty.

  18. Raman spectroscopy using 1550 nm (retina-safe) laser excitation.

    PubMed

    Brouillette, Carl; Huang, Hermes; Smith, Wayne; Farquharson, Stuart

    2011-05-01

    During the past decade, the use of portable Raman analyzers for field measurements has grown dramatically. However, most analyzers use 785 nm excitation lasers that can cause permanent eye damage. To overcome this safety concern, we have built a portable Fourier transform (FT) Raman analyzer using a 1550 nm retina-safe excitation laser and have compared its performance to our 1064 nm FT-Raman analyzer, which uses the same optical design. Raman theory predicts approximately five times lower peak intensities at 1550 nm. Although we found that intensities were as much as 20 times less intense, the analyzer is still capable of measuring spectra of sufficient quality to identify and differentiate chemicals. PMID:21513601

  19. Observations of the Seasonal Polar Icecaps of Mars at 1064 nm

    NASA Technical Reports Server (NTRS)

    Zuber, Maria T.; Smith, David E.

    2003-01-01

    The Mars Orbiter Laser Altimeter (MOLA) is routinely making radiometric observations of Mars at a wavelength of 1064 nm. Although the altimeter function is no longer operational, the MOLA detector continues to measure the reflectivity of the surface. Observations have been obtained almost continuously since the beginning of the Mars Global Surveyor (MGS) mapping mission in February 1999, and are providing measurements relevant to understanding the seasonal cycling of CO2 surface frost.

  20. Experimental study of the stimulated Brillouin scattering saturation at 527 nm

    NASA Astrophysics Data System (ADS)

    Depierreux, S.; Lewis, K.; Labaune, C.; Stenz, C.

    2006-06-01

    This paper presents the first results obtained with the LULI2000 facility on the stimulated Brillouin scattering (SBS) instability developing at 527 nm on solid targets. We describe the experimental configuration, the plasma parameters and give first results of the SBS as function of laser intensity in these plasmas. The Brillouin reflectivity measured at maximum energy is 8%. The measurements are compared with the Brillouin backscattering expected from linear theory in the exponential density profile.

  1. Double-end-pumped Nd:YVO4 slab laser at 1064 nm.

    PubMed

    Xu, Liu; Zhang, Hengli; He, Jingliang; Yu, Xilong; Cui, Li; Mao, Yefei; Sun, Xiao; Lin, Xin; Xing, Jichuan; Xin, Jianguo

    2012-04-20

    We demonstrate a high-power laser diode stacks double-end-pumped Nd:YVO4 1064 nm slab laser with a folded stable-unstable hybrid resonator. An output power of 220 W was obtained at the pump power of 490 W with optical conversion efficiency of 44.9%. At the output power of 202 W, the M2 factors in the unstable direction and in the stable direction were 1.7 and 2.3, respectively. PMID:22534909

  2. The Missing Solar Irradiance Spectrum: 1 to 7 nm

    NASA Astrophysics Data System (ADS)

    Sojka, J. J.; Lewis, M.; David, M.; Schunk, R. W.; Woods, T. N.; Eparvier, F. G.; Warren, H. P.

    2015-12-01

    During large X-class flares the Earth's upper atmospheric E-region responds immediately to solar photons in the 1 to 7 nm range. The response can change the E-region density by factors approaching 10, create large changes in conductivity, and plague HF communications. GOES-XRS provide 0.1 to 0.8 nm and a 0.05 to 0.4 nm integral channels; SOHO-SEM provided a 0 to 50 nm irradiance; TIMED and SORCE-XPS diode measurements also integrated down to 0.1 nm; and most recently SDO-EVE provided a 0.1 to 7 nm irradiance. For atmospheric response to solar flares the cadence is also crucial. Both GOES and SDO provided integral measurements at 10 seconds or better. Unfortunately these measurements have failed to capture the 1 to 7 nm spectral changes that occur during flares. It is these spectral changes that create the major impact since the ionization cross-section of the dominant atmospheric species, N2 and O2, both contain step function changes in the cross-sections. Models of the solar irradiance over this critical wavelength regime have suffered from the need to model the spectral variability based on incomplete measurements. The most sophisticated empirical model FISM [Chamberlin et al., 2008] used 1 nm spectral binning and various implementations of the above integral measurements to describe the 1 to 7 nm irradiance. Since excellent solar observations exist at other wavelengths it is possible to construct an empirical model of the solar atmosphere and then use this model to infer the spectral distribution at wavelengths below 5 nm. This differential emission measure approach has been used successfully in other contexts [e.g., Warren, 2005, Chamberlin et al., 2009]. This paper contrasts the broadband versus spectrally resolved descriptions of the incoming irradiance that affects the upper atmospheric E-layer. The results provide a prescription of what wavelength resolution would be needed to adequately measure the incoming solar irradiance in the 1 to 7 nm range.

  3. Low-k/copper integration scheme suitable for ULSI manufacturing from 90nm to 45nm nodes

    NASA Astrophysics Data System (ADS)

    Nogami, T.; Lane, S.; Fukasawa, M.; Ida, K.; Angyal, M.; Chanda, K.; Chen, F.; Christiansen, C.; Cohen, S.; Cullinan, M.; Dziobkowski, C.; Fitzsimmons, J.; Flaitz, P.; Grill, A.; Gill, J.; Inoue, K.; Klymko, N.; Kumar, K.; Labelle, C.; Lane, M.; Li, B.; Liniger, E.; Madon, A.; Malone, K.; Martin, J.; McGahay, V.; McLaughlin, P.; Melville, I.; Minami, M.; Molis, S.; Nguyen, S.; Penny, C.; Restaino, D.; Sakamoto, A.; Sankar, M.; Sherwood, M.; Simonyi, E.; Shimooka, Y.; Tai, L.; Widodo, J.; Wildman, H.; Ono, M.; McHerron, D.; Nye, H.; Davis, C.; Sankaran, S.; Edelstein, D.; Ivers, T.

    2005-11-01

    This paper discusses low-k/copper integration schemes which has been in production in the 90 nm node, have been developed in the 65 nm node, and should be taken in the 45 nm node. While our baseline 65 nm BEOL process has been developed by extension and simple shrinkage of our PECVD SiCOH integration which has been in production in the 90 nm node with our SiCOH film having k=3.0, the 65 nm SiCOH integration has two other options to go to extend to lower capacitance. One is to add porosity to become ultra low-k (ULK). The other is to stay with low-k SiCOH, which is modified to have a "lower-k". The effective k- value attained with the lower-k (k=2.8) SiCOH processed in the "Direct CMP" scheme is very close to that with an ULK (k=2.5) SiCOH film built with the "Hard Mask Retention" scheme. This paper first describes consideration of these two damascene schemes, whose comparison leads to the conclusion that the lower-k SiCOH integration can have more advantages in terms of process simplicity and extendibility of our 90 nm scheme under certain assumptions. Then describing the k=2.8 SiCOH film development and its successful integration, damascene schemes for 45nm nodes are discussed based on our learning from development of the lower-k 65nm scheme. Capability of modern dry etchers to define the finer patterns, non-uniformity of CMP, and susceptibility to plasma and mechanical strength and adhesion of ULK are discussed as factors to hamper the applicability of ULK.

  4. Applications of combination wavelength (1060-nm and 530-nm) and pulsed Nd:YAG laser for contact laser surgery.

    PubMed

    Liu, K R; Peyman, G A; Myers, J D; Hamlin, S A; Katoh, N

    1989-01-01

    Two pulsed neodimium yittrium aluminum garnet (Nd:YAG) laser systems were evaluated for contact surgery through a fiberoptic system with a sapphire tip. Pulsed Nd:YAG laser at 1060 nm was as effective as continuous-wave Nd:YAG laser in producing tissue incisions. A combination of 1060-nm and 530-nm wavelengths achieved smooth cutting at lower energy levels. Corneal endothelial cell damage occurred at the high power level (7 watts) required for smooth underwater incisions with both continuous wave and pulsed lasers. PMID:2733255

  5. Trends in nanosecond melanosome microcavitation up to 1540 nm

    NASA Astrophysics Data System (ADS)

    Schmidt, Morgan S.; Kennedy, Paul K.; Noojin, Gary D.; Vincelette, Rebecca L.; Thomas, Robert J.; Rockwell, Benjamin A.

    2015-09-01

    Thresholds for microcavitation of bovine and porcine melanosomes were previously reported, using single nanosecond (ns) laser pulses in the visible (532 nm) and the near-infrared (NIR) from 1000 to 1319 nm. Here, we report average radiant exposure thresholds for bovine melanosome microcavitation at additional NIR wavelengths up to 1540 nm, which range from ˜0.159 J/cm2 at 800 nm to 4.5 J/cm2 at 1540 nm. Melanosome absorption coefficients were also estimated, and decreased with increasing wavelength. These values were compared to retinal pigment epithelium coefficients, and to water absorption, over the same wavelength range. Corneal total intraocular energy retinal damage threshold values were estimated and compared to the previous (2007) and recently changed (2014) maximum permissible exposure (MPE) safe levels. Results provide additional data that support the recent changes to the MPE levels, as well as the first microcavitation data at 1540 nm, a wavelength for which melanosome microcavitation may be an ns-pulse skin damage mechanism.

  6. Alternatives to chemical amplification for 193nm lithography

    NASA Astrophysics Data System (ADS)

    Baylav, Burak; Zhao, Meng; Yin, Ran; Xie, Peng; Scholz, Chris; Smith, Bruce; Smith, Thomas; Zimmerman, Paul

    2010-04-01

    Research has been conducted to develop alternatives to chemically amplified 193 nm photoresist materials that will be able to achieve the requirements associated with sub-32 nm device technology. New as well as older photoresist design concepts for non-chemically amplified 193 nm photoresists that have the potential to enable improvements in line edge roughness while maintaining adequate sensitivity, base solubility, and dry etch resistance for high volume manufacturing are being explored. The particular platforms that have been explored in this work include dissolution inhibitor photoresist systems, chain scissioning polymers, and photoresist systems based on polymers incorporating formyloxyphenyl functional groups. In studies of two-component acidic polymer/dissolution inhibitor systems, it was found that compositions using ortho-nitrobenzyl cholate (NBC) as the dissolution inhibitor and poly norbornene hexafluoro alcohol (PNBHFA) as the base resin are capable of printing 90 nm dense line/space patterns upon exposure to a 193 nm laser. Studies of chain scission enhancement in methylmethacrylate copolymers showed that incorporating small amounts of absorptive a-cleavage monomers significantly enhanced sensitivity with an acceptable increase in absorbance at 193 nm. Specifically, it was found that adding 3 mol% of α-methyl styrene (α-MS) reduced the dose to clear of PMMA-based resist from 1400 mJ/cm2 to 420 mJ/cm2. Preliminary data are also presented on a direct photoreactive design concept based on the photo-Fries reaction of formyloxyphenyl functional groups in acrylic copolymers.

  7. Magneto-optical trap for metastable helium at 389 nm

    SciTech Connect

    Koelemeij, J.C.J.; Stas, R.J.W.; Hogervorst, W.; Vassen, W.

    2003-05-01

    We have constructed a magneto-optical trap (MOT) for metastable triplet helium atoms utilizing the 2 {sup 3}S{sub 1}{yields}3 {sup 3}P{sub 2} line at 389 nm as the trapping and cooling transition. The far-red-detuned MOT (detuning {delta}=-41 MHz) typically contains few times 10{sup 7} atoms at a relatively high ({approx}10{sup 9} cm{sup -3}) density, which is a consequence of the large momentum transfer per photon at 389 nm and a small two-body loss rate coefficient (2x10{sup -10} cm{sup 3}/s<{beta}<1.0x10{sup -9} cm{sup 3}/s). The two-body loss rate is more than five times smaller than in a MOT on the commonly used 2 {sup 3}S{sub 1}{yields}2 {sup 3}P{sub 2} line at 1083 nm. Furthermore, laser cooling at 389 nm results in temperatures somewhat lower than those achieved using 1083 nm. The 389-nm MOT exhibits small losses due to two-photon ionization, which have been investigated as well.

  8. High-index nanocomposite photoresist for 193-nm lithography

    NASA Astrophysics Data System (ADS)

    Bae, Woo Jin; Trikeriotis, Makros; Rodriguez, Robert; Zettel, Michael F.; Piscani, Emil; Ober, Christopher K.; Giannelis, Emmanuel P.; Zimmerman, Paul

    2009-03-01

    In immersion lithography, high index fluids are used to increase the numerical aperture (NA) of the imaging system and decrease the minimum printable feature size. Water has been used in first generation immersion lithography at 193 nm to reach the 45 nm node, but to reach the 38 and 32 nm nodes, fluids and resists with a higher index than water are needed. A critical issue hindering the implementation of 193i at the 32 nm node is the availability of high refractive index (n > 1.8) and low optical absorption fluids and resists. It is critical to note that high index resists are necessary only when a high refractive index fluid is in use. High index resist improves the depth of focus (DOF) even without high index fluids. In this study, high refractive index nanoparticles have been synthesized and introduced into a resist matrix to increase the overall refractive index. The strategy followed is to synthesize PGMEA-soluble nanoparticles and then disperse them into a 193 nm resist. High index nanoparticles 1-2 nm in diameter were synthesized by a combination of hydrolysis and sol-gel methods. A ligand exchange method was used, allowing the surface of the nanoparticles to be modified with photoresist-friendly moieties to help them disperse uniformly in the resist matrix. The refractive index and ultraviolet absorbance were measured to evaluate the quality of next generation immersion lithography resist materials.

  9. Power scaling of laser diode pumped Pr3+:LiYF4 cw lasers: efficient laser operation at 522.6 nm, 545.9 nm, 607.2 nm, and 639.5 nm.

    PubMed

    Gün, Teoman; Metz, Philip; Huber, Günter

    2011-03-15

    We report efficient cw laser operation of laser diode pumped Pr(3+)-doped LiYF4 crystals in the visible spectral region. Using two InGaN laser diodes emitting at λ(P)=443.9 nm with maximum output power of 1 W each and a 2.9-mm-long crystal with a doping concentration of 0.5%, output powers of 938 mW, 418 mW, 384 mW, and 773 mW were achieved for the laser wavelengths 639.5 nm, 607.2 nm, 545.9 nm, and 522.6 nm, respectively. The maximum absorbed pump powers were approximately 1.5 W, resulting in slope efficiencies of 63.6%, 32.0%, 52.1%, and 61.5%, as well as electro-optical efficiencies of 9.4%, 4.2%, 3.8%, and 7.7%, respectively. Within these experiments, laser diode-pumped laser action at 545.9 nm was demonstrated for what is believed to be the first time. PMID:21403756

  10. High-performance 193nm photoresists based on fluorosulfonamide

    NASA Astrophysics Data System (ADS)

    Li, Wenjie; Chen, Kuang-Jung; Kwong, Ranee; Lawson, Margaret C.; Khojasteh, Mahmoud; Popova, Irene; Varanasi, P. Rao; Shimokawa, Tsutomu; Yamaguchi, Yoshikazu; Kusumoto, Shiro; Sugiura, Makoto; Kawakami, Takanori; Slezak, Mark; Dabbagh, Gary; Liu, Zhi

    2007-03-01

    The combination of immersion lithography and reticle enhancement techniques (RETs) has extended 193nm lithography into the 45nm node and possibly beyond. In order to fulfill the tight pitch and small critical dimension requirements of these future technology nodes, the performance of 193nm resist materials needs to further improve. In this paper, a high performance 193nm photoresist system based on fluorosulfonamide (FSM) is designed and developed. The FSM group has good transparency at 193nm. Compared to the commonly used hexafluoroalcohol (HFA) group, the trifluoromethyl sulfonamide (TFSM) functionality has a lower pKa value and contains less fluorine atoms. Polymers containing the TFSM functionality have exhibited improved dissolution properties and better etch resistance than their HFA counterparts. Resists based on the FSM-containing polymers have shown superior lithographic performance for line, trench and contact hole levels under the 45nm node exposure conditions. In addition, FSM resists have also demonstrated excellent bright field and dark field compatibility and thereby make it possible to use one resist for both bright field and dark field level applications. The structure, property and lithographic performance of the FSM resist system are reported.

  11. Astrophysical Reaction Rates Obtained By Indirect Techniques

    SciTech Connect

    Tribble, R. E.; Al-Abdullah, T.; Alharbi, A.; Banu, A.; Chen, X.; Clark, H. L.; Fu, C.; Gagliardi, C. A.; Hardy, J. C.; Iacob, V. E.; Lui, Y.-W.; McCleskey, M.; Mukhamedzhanov, A.; Nica, N.; Park, H. I.; Roeder, B.; Simmons, E.; Tabacaru, G.; Tokimoto, Y.; Trache, L.

    2010-08-12

    Indirect techniques have been used to obtain information about reaction rates for several proton capture reactions that occur on short-lived nuclei. The techniques used to carry out the measurements are reviewed and the results obtained are presented. Also future prospects for further measurements with a new facility, T-REX are discussed.

  12. 33 CFR 118.20 - Obtaining information.

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... 33 Navigation and Navigable Waters 1 2010-07-01 2010-07-01 false Obtaining information. 118.20 Section 118.20 Navigation and Navigable Waters COAST GUARD, DEPARTMENT OF HOMELAND SECURITY BRIDGES BRIDGE LIGHTING AND OTHER SIGNALS § 118.20 Obtaining information. Persons desiring information concerning...

  13. 38 CFR 21.5725 - Obtaining benefits.

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... 38 Pensions, Bonuses, and Veterans' Relief 2 2010-07-01 2010-07-01 false Obtaining benefits. 21... benefits. (a) Actions required of the individual. In order to obtain benefits under the educational assistance and subsistence allowance program, an individual must— (1) File a claim for benefits with VA,...

  14. 33 CFR 118.20 - Obtaining information.

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ... 33 Navigation and Navigable Waters 1 2012-07-01 2012-07-01 false Obtaining information. 118.20 Section 118.20 Navigation and Navigable Waters COAST GUARD, DEPARTMENT OF HOMELAND SECURITY BRIDGES BRIDGE LIGHTING AND OTHER SIGNALS § 118.20 Obtaining information. Persons desiring information concerning...

  15. 47 CFR 54.615 - Obtaining services.

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... 47 Telecommunication 3 2011-10-01 2011-10-01 false Obtaining services. 54.615 Section 54.615 Telecommunication FEDERAL COMMUNICATIONS COMMISSION (CONTINUED) COMMON CARRIER SERVICES (CONTINUED) UNIVERSAL SERVICE Universal Service Support for Health Care Providers § 54.615 Obtaining services. (a) Selecting a provider. In selecting...

  16. 42 CFR 442.101 - Obtaining certification.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... section states the requirements for obtaining notice of an ICF/MR's certification before a Medicaid agency... Secretary for an ICF/MR located on an Indian reservation. (c) The agency must obtain notice of certification... provisions pertains to the ICF/MR: (1) An ICF/MR meets the conditions of participation set forth in subpart...

  17. 38 CFR 21.5725 - Obtaining benefits.

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... 38 Pensions, Bonuses, and Veterans' Relief 2 2014-07-01 2014-07-01 false Obtaining benefits. 21... benefits. (a) Actions required of the individual. In order to obtain benefits under the educational assistance and subsistence allowance program, an individual must— (1) File a claim for benefits with VA,...

  18. 38 CFR 21.5725 - Obtaining benefits.

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... 38 Pensions, Bonuses, and Veterans' Relief 2 2013-07-01 2013-07-01 false Obtaining benefits. 21... benefits. (a) Actions required of the individual. In order to obtain benefits under the educational assistance and subsistence allowance program, an individual must— (1) File a claim for benefits with VA,...

  19. 38 CFR 21.5725 - Obtaining benefits.

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ... 38 Pensions, Bonuses, and Veterans' Relief 2 2012-07-01 2012-07-01 false Obtaining benefits. 21... benefits. (a) Actions required of the individual. In order to obtain benefits under the educational assistance and subsistence allowance program, an individual must— (1) File a claim for benefits with VA,...

  20. 38 CFR 21.5725 - Obtaining benefits.

    Code of Federal Regulations, 2011 CFR

    2011-07-01

    ... 38 Pensions, Bonuses, and Veterans' Relief 2 2011-07-01 2011-07-01 false Obtaining benefits. 21... benefits. (a) Actions required of the individual. In order to obtain benefits under the educational assistance and subsistence allowance program, an individual must— (1) File a claim for benefits with VA,...

  1. Ready Reference. How To Obtain an ISBN; How To Obtain an ISSN; How To Obtain an SAN.

    ERIC Educational Resources Information Center

    Koltay, Emery

    2003-01-01

    These three articles describe ISBNs (International Standard Book Numbers); ISSNs (International Standard Serial Numbers); and SANs (Standard Address Numbers), for organizations served by the book industry; and explains how to apply to obtain the appropriate numbers. (LRW)

  2. Passivation of c-Si surfaces by sub-nm amorphous silicon capped with silicon nitride

    SciTech Connect

    Wan, Yimao Yan, Di; Bullock, James; Zhang, Xinyu; Cuevas, Andres

    2015-12-07

    A sub-nm hydrogenated amorphous silicon (a-Si:H) film capped with silicon nitride (SiN{sub x}) is shown to provide a high level passivation to crystalline silicon (c-Si) surfaces. When passivated by a 0.8 nm a-Si:H/75 nm SiN{sub x} stack, recombination current density J{sub 0} values of 9, 11, 47, and 87 fA/cm{sup 2} are obtained on 10 Ω·cm n-type, 0.8 Ω·cm p-type, 160 Ω/sq phosphorus-diffused, and 120 Ω/sq boron-diffused silicon surfaces, respectively. The J{sub 0} on n-type 10 Ω·cm wafers is further reduced to 2.5 ± 0.5 fA/cm{sup 2} when the a-Si:H film thickness exceeds 2.5 nm. The passivation by the sub-nm a-Si:H/SiN{sub x} stack is thermally stable at 400 °C in N{sub 2} for 60 min on all four c-Si surfaces. Capacitance–voltage measurements reveal a reduction in interface defect density and film charge density with an increase in a-Si:H thickness. The nearly transparent sub-nm a-Si:H/SiN{sub x} stack is thus demonstrated to be a promising surface passivation and antireflection coating suitable for all types of surfaces encountered in high efficiency c-Si solar cells.

  3. Al-free active region laser diodes at 894 nm for compact Cesium atomic clocks

    NASA Astrophysics Data System (ADS)

    Von Bandel, N.; Bébé Manga Lobé, J.; Garcia, M.; Larrue, A.; Robert, Y.; Vinet, E.; Lecomte, M.; Drisse, O.; Parillaud, O.; Krakowski, M.

    2015-03-01

    Time-frequency applications are in need of high accuracy and high stability clocks. Compact industrial Cesium atomic clocks optically pumped is a promising area that could satisfy these demands. However, the stability of these clocks relies, among others, on the performances of laser diodes that are used for atomic pumping. This issue has led the III-V Lab to commit to the European Euripides-LAMA project that aims to provide competitive compact optical Cesium clocks for earth applications. This work will provide key experience for further space technology qualification. We are in charge of the design, fabrication and reliability of Distributed-Feedback diodes (DFB) at 894nm (D1 line of Cesium) and 852nm (D2 line). The use of D1 line for pumping will provide simplified clock architecture compared to D2 line pumping thanks to simpler atomic transitions and larger spectral separation between lines in the 894nm case. Also, D1 line pumping overcomes the issue of unpumped "dark states" that occur with D2 line. The modules should provide narrow linewidth (<1MHz), very good reliability in time and, crucially, be insensitive to optical feedback. The development of the 894nm wavelength is grounded on our previous results for 852nm DFB. Thus, we show our first results from Al-free active region with InGaAsP quantum well broad-area lasers (100μm width, with lengths ranging from 2mm to 4mm), for further DFB operation at 894nm. We obtained low internal losses below 2cm-1, the external differential efficiency is 0.49W/A with uncoated facets and a low threshold current density of 190A/cm², for 2mm lasers at 20°C.

  4. Characterization of luminescent chromophore obtained from silica spheres

    NASA Astrophysics Data System (ADS)

    Kang, Kwang-Sun

    2015-02-01

    Blue light emitting chromophores have been separated from silica spheres by soaking them into acetone for 120 days. The luminescent chromophores were not obtained from other solvents, including ether, methanol, ethanol, 2-propanol, chloroform and tetrahydrofuran. According to the Fourier transform infrared spectrum, the luminescent material is composed of C-OH, -CH2, -CH3, C=O, and Si-O-Si. UV-visible absorption peak of the chromophore is at 5.17 eV (240 nm). Field emission scanning electron microscope images show small cracks on the surface of aged spheres. The luminescence peak was at 2.81 eV (441 nm) for excitation energy between 3.88 and 3.35 eV and slightly shifted toward lower energy for excitation energy lower than 3.35 eV. The deconvoluted luminescent spectrum shows two emission bands at 3.08 and 2.74 eV, which are well-matched the oxygen deficient center model. Compared to the absorption peak (5.17 eV) and the emission peak (2.81 eV), large Stokes shift (2.36 eV) is observed.

  5. Structure of boundaries in composite materials obtained using explosive loading

    NASA Astrophysics Data System (ADS)

    Lysak, V. I.; Kuz'min, S. V.; Krokhalev, A. V.; Grinberg, B. A.

    2013-11-01

    We have presented the results of studying the fine structure of interphase boundaries for a number of composite materials obtained by methods of explosive welding and explosive compacting of powder mixtures. Joints of different metals (titanium-low-carbon steel, copper-tantalum) and metals with refractory carbides (chromium carbide-titanium) have been investigated. Under welding, pairs differed from each other by the type of interaction. It has been found that, in these composites, interphase boundaries exhibit a final thickness on the order of 200 nm, throughout which the composition of the material changes gradually from a composition that corresponds to one of the components of the composite to a composition that corresponds to the second component. It has been shown that the structure of interphase boundaries is complex. With the limited solubility of components along boundaries, two fairly thick crystalline interlayers are detected, the total thickness of which is equal to the total thickness of the boundary; between the interlayers, there is a thin (to 5-7 nm in thickness) interlayer with a crystalline or amorphous structure.

  6. Negative tone imaging (NTI) with KrF: extension of 248nm IIP lithography to under sub-20nm logic device

    NASA Astrophysics Data System (ADS)

    Oh, Tae-Hwan; Kim, Tae-Sun; Kim, Yura; Kim, Jahee; Heo, Sujeong; Youn, Bumjoon; Seo, Jaekyung; Yoon, Kwang-Sub; Choi, Byoung-il

    2013-03-01

    One of the most prospective alternative lithography ways prior to EUV implementation is the reverse imaging by means of a negative tone development (NTD) process with solvent-based developer. Contact and trench patterns can be printed in CAR (Chemically amplified resist) using a bright field mask through NTD development, and can give much better image contrast (NILS) than PTD process. Not only for contact or trench masks, but also pattering of IIP (Ion Implantation) layers whose mask opening ratio is less than 20% may get the benefit of NTD process, not only in the point of aerial imaging, but also in achievement of vertical resist profile, especially for post gate layers which have complex sub_topologies and nitride substrate. In this paper, we present applications for the NTD technique to IIP (Ion Implantation) layer lithography patterning, via KrF exposure, comparing the performance to that of the PTD process. Especially, to extend 248nm IIP litho to sub-20nm logic device, optimization of negative tone imaging (NTI) with KrF exposure is the main focus in this paper. With the special resin system designed for KrF NTD process, even sub 100nm half-pitch trench pattern can be defined with enough process margin and vertical resist profiles can be also obtained on the nitride substrate with KrF exposure.

  7. Sub-10 nm strontium titanate nanocubes highly dispersed in non-polar organic solvents.

    PubMed

    Fujinami, Kyoichi; Katagiri, Kiyofumi; Kamiya, Jumpei; Hamanaka, Tadashi; Koumoto, Kunihito

    2010-10-01

    Strontium titanate (SrTiO(3)) nanoparticles with well defined cubic shape and sub-10 nm size that are highly dispersible in non-polar organic solvents were successfully synthesized by hydrothermal (HT) processing. Water-soluble titanium complexes and strontium hydroxide were employed as precursors. When the HT process was carried out without oleic acid, the SrTiO(3) particles obtained were relatively large and aggregated. However, SrTiO(3) nanocubes that are highly dispersible in hexane were obtained via the HT process using oleic acid and hydrazine. PMID:20844789

  8. Retinal Oximetry with 510-600 nm Light Based on Partial Least-Squares Regression Technique

    NASA Astrophysics Data System (ADS)

    Arimoto, Hidenobu; Furukawa, Hiromitsu

    2010-11-01

    The oxygen saturation distribution in the retinal blood stream is estimated by measuring spectral images and adopting the partial-least squares regression. The wavelengths range used for the calculation is from 510 to 600 nm. The regression model for estimating the retinal oxygen saturation is built on the basis of the arterial and venous blood spectra. The experiment is performed using an originally designed spectral ophthalmoscope. The obtained two-dimensional (2D) oxygen saturation indicates the reasonable oxygen level across the retina. The measurement quality is compared with those obtained using other wavelengths sets and data processing methods.

  9. Q-switched 1329  nm Nd:CNGG laser.

    PubMed

    Xiao, Kun; Lin, Bin; Zhang, Qiu-Lin; Zhang, Dong-Xiang; Feng, Bao-Hua; He, Jing-Liang; Zhang, Huai-Jin; Wang, Ji-Yang

    2015-08-10

    We demonstrate a laser-diode-pumped Q-switched 1329 nm neodymium-doped calcium-niobium-gallium-garnet (Nd:CNGG) laser using a V:YAG crystal as a saturable absorber. An average output power of 353 mW and a repetition rate of 13.43 kHz for Q-switched pulses were obtained. The pulse width was from 124 to 151.4 ns under different pump powers. Output power of 685 mW was obtained without the V:YAG crystal inserted. PMID:26368377

  10. Recent developments in Fourier domain mode locked lasers for optical coherence tomography: imaging at 1310 nm vs. 1550 nm wavelength.

    PubMed

    Biedermann, Benjamin R; Wieser, Wolfgang; Eigenwillig, Christoph M; Huber, Robert

    2009-07-01

    We report on recent progress in Fourier domain mode-locking (FDML) technology. The paper focuses on developments beyond pushing the speed of these laser sources. After an overview of improvements to FDML over the last three years, a brief analysis of OCT imaging using FDML lasers with different wavelengths is presented. For the first time, high speed, high quality FDML imaging at 1550 nm is presented and compared to a system at 1310 nm. The imaging results of human skin for both wavelengths are compared and analyzed. Sample arm optics, power on the sample, heterodyne gain, detection bandwidth, colour cut levels and sample location have been identical to identify the influence of difference in scattering and water absorption. The imaging performance at 1310 nm in human skin is only slightly better and the results suggest that water absorption only marginally affects the penetration depth in human skin at 1550 nm. For several applications this wavelength may be preferred. PMID:19565537

  11. The Spectrum of Th-Ar Hollow Cathode Lamps in the 691nm to 5804nm region Database

    National Institute of Standards and Technology Data Gateway

    SRD 161 The Spectrum of Th-Ar Hollow Cathode Lamps in the 691nm to 5804nm region Database (Web, free access)   This atlas presents observations of the infra-red (IR) spectrum of a low current Th-Ar hollow cathode lamp with the 2-m Fourier transform spectrometer (FTS) at NIST. These observations establish more than 2400 lines that are suitable for use as wavelength standards in the range 691 nm to 5804 nm. The observations were made in collaboration with the European Southern Observatory (ESO), in order to provide calibration reference data for new high-resolution Echelle spectrographs, such as the Cryogenic High-Resolution IR Echelle Spectrograph ([CRIRES]), ESO's new IR spectrograph at the Very Large Telescope in Chile.

  12. 750 nm 1.5 W frequency-doubled semiconductor disk laser with a 44 nm tuning range.

    PubMed

    Saarinen, Esa J; Lyytikäinen, Jari; Ranta, Sanna; Rantamäki, Antti; Sirbu, Alexei; Iakovlev, Vladimir; Kapon, Eli; Okhotnikov, Oleg G

    2015-10-01

    We demonstrate 1.5 W of output power at the wavelength of 750 nm by intracavity frequency doubling a wafer-fused semiconductor disk laser diode-pumped at 980 nm. An optical-to-optical efficiency of 8.3% was achieved using a bismuth borate crystal. The wavelength of the doubled emission could be tuned from 720 to 764 nm with an intracavity birefringent plate. The beam quality parameter M2 of the laser output was measured to be below 1.5 at all pump powers. The laser is a promising tool for biomedical applications that can take advantage of the large penetration depth of light in tissue in the 700-800 nm spectral range. PMID:26421536

  13. High-efficiency high-brightness diode lasers at 1470 nm/1550 nm for medical and defense applications

    NASA Astrophysics Data System (ADS)

    Gallup, Kendra; Ungar, Jeff; Vaissie, Laurent; Lammert, Rob; Hu, Wentao

    2012-03-01

    Diode lasers in the 1400 nm to 1600 nm regime are used in a variety of applications including pumping Er:YAG lasers, range finding, materials processing, aesthetic medical treatments and surgery. In addition to the compact size, efficiency, and low cost advantages of traditional diode lasers, high power semiconductor lasers in the eye-safe regime are becoming widely used in an effort to minimize the unintended impact of potentially hazardous scattered optical radiation from the laser source, the optical delivery system, or the target itself. In this article we describe the performance of high efficiency high brightness InP laser bars at 1470nm and 1550nm developed at QPC Lasers for applications ranging from surgery to rangefinding.

  14. Compact Fiber Laser for 589nm Laser Guide Star Generation

    NASA Astrophysics Data System (ADS)

    Pennington, D.; Drobshoff, D.; Mitchell, S.; Brown, A.

    Laser guide stars are crucial to the broad use of astronomical adaptive optics, because they facilitate access to a large fraction of possible locations on the sky. Lasers tuned to the 589 nm atomic sodium resonance can create an artificial beacon at altitudes of 95-105 km, thus coming close to reproducing the light path of starlight. The deployment of multiconjugate adaptive optics on large aperture telescopes world-wide will require the use of three to nine sodium laser guide stars in order to achieve uniform correction over the aperture with a high Strehl value. Current estimates place the minimum required laser power at > 10 W per laser for a continuous wave source, though a pulsed format, nominally 6?s in length at ~ 16.7 kHz, is currently preferred as it would enable tracking the laser through the Na layer to mitigate spot elongation. The lasers also need to be compact, efficient, robust and turnkey. We are developing an all-fiber laser system for generating a 589 nm source for laser-guided adaptive optics. Fiber lasers are more compact and insensitive to alignment than their bulk laser counterparts, and the heat-dissipation characteristics of fibers, coupled with the high efficiencies demonstrated and excellent spatial mode characteristics, make them a preferred candidate for many high power applications. Our design is based on sum-frequency mixing an Er/Yb:doped fiber laser operating at 1583 nm with a 938 nm Nd:silica fiber laser in a periodically poled crystal to generate 589 nm. We have demonstrated 14 W at 1583 nm with an Er/Yb:doped fiber laser, based on a Koheras single frequency fiber oscillator amplified in an IPG Photonics fiber amplifier. The Nd:silica fiber laser is a somewhat more novel device, since the Nd3+ ions must operate on the resonance transition (i.e. 4F3/2-4I9/2), while suppressing ASE losses at the more conventional 1088 nm transition. Optimization of the ratio of the fiber core and cladding permits operation of the laser at room

  15. Generation of Thermospheric OI 845 nm Emission by Bowen Fluorescence

    NASA Astrophysics Data System (ADS)

    Huestis, D. L.; Sharpee, B. D.; Cosby, P. C.; Slanger, T. G.

    2006-12-01

    777 and 845 nm emissions from the 3p-3s multiplets of atomic oxygen are commonly observed at non-auroral latitudes in the terrestrial nightglow. By studying the relative strengths of these emissions we can learn something about the mechanisms that produce them and what they can teach us about the atmosphere. Recently [1] we have used intensity-calibrated sky spectra from the Keck telescopes to investigate the relative strengths of a wide range of O-atom Rydberg lines and have confirmed that electron-ion radiative recombination is a primary source of excitation for both the triplet and quintet systems. Following the intensity of the 777 and 845 nm lines during the night, we find that for most of the night the quintet 777 nm line is consistently stronger than the triplet 845 nm line, with a nearly constant intensity ratio I(777)/I(845) near 2.3, although both intensities fall rapidly as the night progresses. However, late in the night the 845 nm intensity levels off, while the 777 nm intensity continues to fall, and the I(777)/I(845) ratio plunges by a factor of 5-10. We interpret these observations as indicating that the O-atom quintet states are still being excited by the same mechanism as earlier in the night, i.e. radiative recombination, but some triplet states are also being excited by an additional mechanism. Such a mechanism has been proposed before [2-6] but not previously observed directly in the terrestrial nightglow. The oxygen triplet 3d-2p transition at 102.576 nm is in close coincidence with the solar hydrogen Lyman-β line at 102.572 nm. Radiative transport in the hydrogen geocorona will deliver Lyman-β intensity into the Earth's shadow and will produce triplet O(3d 3D) high in the atmosphere, even prior to direct solar illumination. The result is observable in a radiative cascade sequence 3d-3p(1129 nm) → 3p- 3s(845 nm) → 3s-2p(130 nm). A similar effect is observed in the H-α emission, which is also excited by Lyman-β absorption. This process

  16. Microdrilling of metals using femtosecond laser pulses and high average powers at 515 nm and 1030 nm

    NASA Astrophysics Data System (ADS)

    Döring, S.; Ancona, A.; Hädrich, S.; Limpert, J.; Nolte, S.; Tünnermann, A.

    2010-07-01

    We investigate the microdrilling of metals (stainless steel, copper and tungsten) for two different wavelengths, 1030 nm and 515 nm, in the regime of femtosecond laser pulses. An ytterbium-doped fibre CPA system provides high pulse energies (up to 70 μJ) and high repetition rates (up to 800 kHz), corresponding to high average powers of about 50 W, for this experimental study.

  17. 25 CFR 162.539 - Must I obtain a WEEL before obtaining a WSR lease?

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... AND PERMITS Wind and Solar Resource Leases Wsr Leases § 162.539 Must I obtain a WEEL before obtaining... direct result of energy resource information gathered from a WEEL activity, obtaining a WEEL is not...

  18. 25 CFR 162.539 - Must I obtain a WEEL before obtaining a WSR lease?

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... AND PERMITS Wind and Solar Resource Leases Wsr Leases § 162.539 Must I obtain a WEEL before obtaining... direct result of energy resource information gathered from a WEEL activity, obtaining a WEEL is not...

  19. Stable, high-power, single-frequency generation at 532 nm from a diode-bar-pumped Nd:YAG ring laser with an intracavity LBO frequency doubler.

    PubMed

    Martin, K I; Clarkson, W A; Hanna, D C

    1997-06-20

    We obtained 2.5 W of single-frequency TEM(00) output at 532 nm using a Brewster-angled LBO crystal for intracavity second-harmonic generation in a diode-bar-pumped Nd:YAG laser. By inserting a thin uncoated étalon, the 1061.4-nm laser transition can be selected, generating 1.6 W of output at 530.7 nm. PMID:18253441

  20. Analysis of Cervical Supernatant Samples Luminescence Using 355 nm Laser

    NASA Astrophysics Data System (ADS)

    Vaitkuviene, A.; Gegzna, V.; Kurtinaitiene, R.; Stanikunas, R.; Rimiene, J.; Vaitkus, J.

    2010-05-01

    The biomarker discovery for accurate detection and diagnosis of cervical carcinoma and its malignant precursors represents one of the current challenges in clinical medicine. Laser induced autofluorescence spectra in cervical smear content were fitted to predict the cervical epithelium diagnosis as a lab off "optical biopsy" method. Liquid PAP supernatant sediment dried on Quartz plate spectroscopy was performed by 355 nm Nd YAG microlaser STA-1 (Standa, Ltd). For comparison a liquid supernatant spectroscopy was formed by laboratory "Perkin Elmer LS 50B spetrometer at 290, 300, 310 nm excitations. Analysis of spectrum was performed by approximation using the multi-peaks program with Lorentz functions for the liquid samples and with Gaussian functions for the dry samples. Ratio of spectral components area to the area under whole experimental curve (SPP) was calculated. The spectral components were compared by averages of SPP using Mann-Whitney U-test in histology groups. Results. Differentiation of Normal and HSIL/CIN2+ cases in whole supernatant could be performed by stationary laboratory lamp spectroscopy at excitation 290 nm and emission >379 nm with accuracy AUC 0,69, Sens 0,72, Spec 0,65. Differentiation Normal versus HSIL/CIN2+ groups in dried enriched supernatant could be performed by 355 nm microlaser excitation at emission 405-424 nm with accuracy (AUC 0,96, Sens 0,91, Spec 1.00). Diagnostic algorithm could be created for all histology groups differentiation under 355 nm excitation. Microlaser induced "optical biopsy "looks promising method for cervical screening at the point of care.

  1. High-brightness 800nm fiber-coupled laser diodes

    NASA Astrophysics Data System (ADS)

    Berk, Yuri; Levy, Moshe; Rappaport, Noam; Tessler, Renana; Peleg, Ophir; Shamay, Moshe; Yanson, Dan; Klumel, Genadi; Dahan, Nir; Baskin, Ilya; Shkedi, Lior

    2014-03-01

    Fiber-coupled laser diodes have become essential sources for fiber laser pumping and direct energy applications. Single emitters offer reliable multi-watt output power from a 100 m lateral emission aperture. By their combination and fiber coupling, pump powers up to 100 W can be achieved from a low-NA fiber pigtail. Whilst in the 9xx nm spectral range the single emitter technology is very mature with <10W output per chip, at 800nm the reliable output power from a single emitter is limited to 4 W - 5 W. Consequently, commercially available fiber coupled modules only deliver 5W - 15W at around 800nm, almost an order of magnitude down from the 9xx range pumps. To bridge this gap, we report our advancement in the brightness and reliability of 800nm single emitters. By optimizing the wafer structure, laser cavity and facet passivation process we have demonstrated QCW device operation up to 19W limited by catastrophic optical damage to the 100 μm aperture. In CW operation, the devices reach 14 W output followed by a reversible thermal rollover and a complete device shutdown at high currents, with the performance fully rebounded after cooling. We also report the beam properties of our 800nm single emitters and provide a comparative analysis with the 9xx nm single emitter family. Pump modules integrating several of these emitters with a 105 μm / 0.15 NA delivery fiber reach 35W in CW at 808 nm. We discuss the key opto-mechanical parameters that will enable further brightness scaling of multi-emitter pump modules.

  2. A 1.5-W frequency doubled semiconductor disk laser tunable over 40 nm at around 745 nm

    NASA Astrophysics Data System (ADS)

    Saarinen, Esa J.; Lyytikäinen, Jari; Ranta, Sanna; Rantamäki, Antti; Saarela, Antti; Sirbu, Alexei; Iakovlev, Vladimir; Kapon, Eli; Okhotnikov, Oleg G.

    2016-03-01

    We report on a semiconductor disk laser emitting 1.5 W of output power at the wavelength of 745 nm via intracavity frequency doubling. The high power level and the < 40 nm tuning range make the laser a promising tool for medical treatments that rely on photosensitizing agents and biomarkers in the transmission window of tissue between 700 and 800 nm. The InP-based gain structure of the laser was wafer-fused with a GaAs-based bottom mirror and thermally managed with an intracavity diamond heat spreader. The structure was pumped with commercial low-cost 980 nm laser diode modules. Laser emission at 1490 nm was frequency-doubled with a bismuth borate crystal that was cut for type I critical phase matching. At the maximum output power, we achieved an optical-to-optical efficiency of 8.3% with beam quality parameter M2 below 1.5. The laser wavelength could be tuned with an intracavity birefringent plate from 720 to 764 nm.

  3. Fabricating nanopores with diameters of sub-1 nm to 3 nm using multilevel pulse-voltage injection

    PubMed Central

    Yanagi, Itaru; Akahori, Rena; Hatano, Toshiyuki; Takeda, Ken-ichi

    2014-01-01

    To date, solid-state nanopores have been fabricated primarily through a focused-electronic beam via TEM. For mass production, however, a TEM beam is not suitable and an alternative fabrication method is required. Recently, a simple method for fabricating solid-state nanopores was reported by Kwok, H. et al. and used to fabricate a nanopore (down to 2 nm in size) in a membrane via dielectric breakdown. In the present study, to fabricate smaller nanopores stably—specifically with a diameter of 1 to 2 nm (which is an essential size for identifying each nucleotide)—via dielectric breakdown, a technique called “multilevel pulse-voltage injection” (MPVI) is proposed and evaluated. MPVI can generate nanopores with diameters of sub-1 nm in a 10-nm-thick Si3N4 membrane with a probability of 90%. The generated nanopores can be widened to the desired size (as high as 3 nm in diameter) with sub-nanometre precision, and the mean effective thickness of the fabricated nanopores was 3.7 nm. PMID:24847795

  4. Optical coherence tomography based imaging of dental demineralisation and cavity restoration in 840 nm and 1310 nm wavelength regions

    NASA Astrophysics Data System (ADS)

    Damodaran, Vani; Rao, Suresh Ranga; Vasa, Nilesh J.

    2016-08-01

    In this paper, a study of in-house built optical coherence tomography (OCT) system with a wavelength of 840 nm for imaging of dental caries, progress in demineralisation and cavity restoration is presented. The caries when imaged with the 840 nm OCT system showed minute demineralisation in the order of 5 μm. The OCT system was also proposed to study the growth of lesion and this was demonstrated by artificially inducing caries with a demineralisation solution of pH 4.8. The progress of carious lesion to a depth of about 50-60 μm after 60 hours of demineralisation was clearly observed with the 840 nm OCT system. The tooth samples were subjected to accelerated demineralisation condition at pH of approximately 2.3 to study the adverse effects and the onset of cavity formation was clearly observed. The restoration of cavity was also studied by employing different restorative materials (filled and unfilled). In the case of restoration without filler material (unfilled), the restoration boundaries were clearly observed. Overall, results were comparable with that of the widely used 1310 nm OCT system. In the case of restoration with filler material, the 1310 nm OCT imaging displayed better imaging capacity due to lower scattering than 840 nm imaging.

  5. Magnetoelastically induced magnetic anisotropy transition in [CoO5nm/CoPt7nm]5 multilayer films

    NASA Astrophysics Data System (ADS)

    Guo, Lei; Harumoto, Takashi; Sannomiya, Takumi; Muraishi, Shinji; Nakamura, Yoshio; Shi, Ji

    2016-06-01

    The magnetic anisotropy transition of [CoO5nm/CoPt7nm]5 multilayer film with respect to post-annealing has been studied systematically. It undergoes a smooth transition from longitudinal magnetic anisotropy (LMA) to perpendicular magnetic anisotropy (PMA) upon annealing and returns backward to LMA at high temperature of 550 °C. The strongest PMA of [CoO5nm/CoPt7nm]5 is achieved after post-annealing at 300 °C and the tolerable post-annealing temperature with strong PMA is up to 400 °C, which indicates this multilayer film could be a potential candidate for the PMA application at middle-high-temperature-region between 300 °C and 400 °C. The mechanism responsible for the transition of magnetic anisotropy has been investigated by analyzing CoO/CoPt interface and CoPt layer internal stress. It is found the effective PMA energy is proportional to the in-plane tensile stress of CoPt layer but is inversely proportional to the roughness of CoO/CoPt interface. Finally, by means of low temperature experiment we demonstrate the magnetic anisotropy transition observed in [CoO5nm/CoPt7nm]5 multilayer film is mainly attributed to the change of CoPt layer in-plane tensile stress.

  6. Antifungal activity of silver nanoparticles obtained by green synthesis.

    PubMed

    Mallmann, Eduardo José J; Cunha, Francisco Afrânio; Castro, Bruno N M F; Maciel, Auberson Martins; Menezes, Everardo Albuquerque; Fechine, Pierre Basílio Almeida

    2015-01-01

    Silver nanoparticles (AgNPs) are metal structures at the nanoscale. AgNPs have exhibited antimicrobial activities against fungi and bacteria; however synthesis of AgNPs can generate toxic waste during the reaction process. Accordingly, new routes using non-toxic compounds have been researched. The proposal of the present study was to synthesize AgNPs using ribose as a reducing agent and sodium dodecyl sulfate (SDS) as a stabilizer. The antifungal activity of these particles against C. albicans and C. tropicalis was also evaluated. Stable nanoparticles 12.5 ± 4.9 nm (mean ± SD) in size were obtained, which showed high activity against Candida spp. and could represent an alternative for fungal infection treatment. PMID:25923897

  7. Research of the Additional Losses Occurring in Optical Fiber at its Multiple Bends in the Range Waves 1310nm, 1550nm and 1625nm Long

    NASA Astrophysics Data System (ADS)

    Yurchenko, A. V.; Gorlov, N. I.; Alkina, A. D.; Mekhtiev, A. D.; Kovtun, A. A.

    2016-01-01

    Article is devoted to research of the additional losses occurring in the optical fiber at its multiple bends in the range waves of 1310 nanometers, 1550 nanometers and 1625 nanometers long. Article is directed on creation of the external factors methods which allow to estimate and eliminate negative influence. The automated way of calculation of losses at a bend is developed. Results of scientific researches are used by engineers of “Kazaktelekom” AS for practical definition of losses service conditions. For modeling the Wolfram|Alpha environment — the knowledge base and a set of computing algorithms was chosen. The greatest losses are noted on wavelength 1310nm and 1625nm. All dependences are nonlinear. Losses with each following excess are multiplicative.

  8. Magnetospheric Imaging of EUV Emissions at 83.4 and 30.4 NM Wavelengths

    NASA Astrophysics Data System (ADS)

    Garrido, Dante Espino

    Magnetospheric images are constructed from resonant scattering of emissions by He^+ 30.4-nm and O^+ 83.4-nm ions from different spatial locations to study the structure of the intensities and its relation to the distribution of He ^+ and O^+ ions around the Earth. The image intensities at these EUV wavelengths were obtained from a knowledge of ion scattering rates and available data on ion densities. This particular approach is called forward modelling and consists of the calculation of simulated EUV images of the magnetosphere. Different regions in the magnetosphere have been considered in this study to determine the dependence of the image intensities on ion energies and ion drift speeds with respect to the Sun-Earth line. Hot O^+ ions in the energy range from 1 keV to 50 keV are present in the plasma sheet with typical densities of the order of 0.1 ions cm^{-3} arising during disturbed times. Image intensities of the order of a few millirayleighs were obtained in our simulations for these densities. During quiet times the densities are of the order of 0.05 ions cm^{-3}. The reduction of the image intensities as a result of Doppler shifts caused by ion motion relative to the Sun-Earth line is discussed in detail and the effects of ion dynamics (particle acceleration) in the polar cap on the image intensities have also been analyzed for both He^+ and O^+ ions. The possibility of detecting polar outflows may also depend on the location of the imager. Simulated images of the plasmasphere and trough regions in both 30.4-nm and 83.4-nm wavelengths have been obtained to reflect the relative abundance of the ions in these regions. Photometric intensities of He^+ at 30.4 nm were obtained from a spinning rocket at an altitude of 435 km. The different viewing angles covered a wide range of regions in the magnetosphere, and this particular rocket geometry offered the possibility of obtaining the He^+ ion distribution from the measured intensities. This method (forward

  9. Obtaining of new magnetic nanocomposites based on modified polysaccharide.

    PubMed

    Tudorachi, Nita; Chiriac, Aurica

    2013-10-15

    The study presents the preparation of some composite materials with magnetic properties by two different encapsulation methods of magnetite (Fe3O4) in a polymer matrix based on carboxymethyl starch-g-polylactic acid (CMS-g-PLA). The copolymer matrix used to obtain the magnetic nanocomposites was synthesized by grafting reaction of carboxymethyl starch (CMS) with D,L-lactic acid (DLLA), in the presence of Sn octanoate [Sn(Oct)2] as catalyst. Magnetite was obtained by co-precipitation from aqueous salt solutions FeCl2/FeCl3 (molar ratio 1/2). The magnetic composites were prepared by precipitation method in acetone (non-solvent) of the DMSO solutions of magnetite and copolymer, and synthesis in situ of the nanocomposites. In the first case, the particle size measured by DLS-technique was 168 nm, and the magnetization was 46.82 emu/g, while after in situ synthesis, the composite materials showed smaller size (141 nm), but the magnetization was reduced (3.04 emu/g). The higher magnetization in the first case is due to the great degree of encapsulation of the magnetite, which was about 43.4 wt.%, compared to 4.37 wt.% for the in situ synthesis (determined by thermogravimetry). The CMS-g-PLA copolymer, magnetite, and the nanocomposites were characterized by infrared spectroscopy (FTIR), near infrared chemical imagistic (NIR-CI), dynamic light scattering (DLS) technique, X-ray diffraction (WAXD), scanning electron microscopy (SEM), vibrating sample magnetometer (VSM) and thermal analyses. Since the polymer matrix and magnetite are biodegradable and biocompatible, the magnetic nanocomposites can be used for conjugation of some drugs. The polymer matrix CMS-g-PLA acts as a shell, and vehicle for the active component, whereas magnetite is the component which makes targeting possible by external magnetic field manipulation. PMID:23987367

  10. Cross-correlation frequency-resolved optical gating of white-light continuum (500–900 nm) generated in bulk media by 1053 nm laser pulses

    NASA Astrophysics Data System (ADS)

    Imran, T.; Hussain, M.; Figueira, G.

    2016-06-01

    We have efficiently characterized the white-light continuum (WLC) generation covering 500–900 nm in a bulk sapphire plate using 280 fs pulse duration, 1053 nm center-wavelength seed laser pulses. We have acquired the well-optimized smoother region of the WLC spectrum successfully by using an FGS-900 color glass filter (Edmund Optics, Inc.). We have suppressed the spectral components below 500 nm and over 900 nm including an intense 1053 nm residual seed laser peak of the WLC spectrum. The experimental artifacts have been avoided by suppressing the intense 1053 nm seed laser. We employed the sum frequency generation cross-correlation frequency-resolved optical gating (SFG-XFROG) technique for characterization. The XFROG measurement was carried out by introducing the crystal dithering method up to 10° in 2° intervals to obtain the phase matching effectively over the filtered and smoother region of the WLC spectrum. This well-optimized WLC region covering 500–900 nm has significant importance for use as a seed pulse in an optical parametric chirped pulse amplification (OPCPA) system.

  11. Mass culture of photobacteria to obtain luciferase

    NASA Technical Reports Server (NTRS)

    Chappelle, E. W.; Picciolo, G. L.; Rich, E., Jr.

    1969-01-01

    Inoculating preheated trays containing nutrient agar with photobacteria provides a means for mass culture of aerobic microorganisms in order to obtain large quantities of luciferase. To determine optimum harvest time, growth can be monitored by automated light-detection instrumentation.

  12. 48 CFR 53.107 - Obtaining forms.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... (see 41 CFR 101-26.302). Standard forms adapted for computer preparation (see 53.105) or with special... Government Printing Office (GPO). (b) Contractors and other parties may obtain standard and optional...

  13. Treatment of biomass to obtain ethanol

    DOEpatents

    Dunson, Jr., James B.; Elander, Richard T.; Tucker, III, Melvin P.; Hennessey, Susan Marie

    2011-08-16

    Ethanol was produced using biocatalysts that are able to ferment sugars derived from treated biomass. Sugars were obtained by pretreating biomass under conditions of high solids and low ammonia concentration, followed by saccharification.

  14. 47 CFR 54.615 - Obtaining services.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... provided under § 54.621, that the requester cannot obtain toll-free access to an Internet service provider... thing of value; (6) If the service or services are being purchased as part of an aggregated...

  15. 47 CFR 54.615 - Obtaining services.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... provided under § 54.621, that the requester cannot obtain toll-free access to an Internet service provider... thing of value; (6) If the service or services are being purchased as part of an aggregated...

  16. 40 CFR 35.6305 - Obtaining supplies.

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ....6325 through 35.6340, and 35.6350. Supplies obtained with Core Program funds must be for non-site-specific purposes. All purchases of supplies under the Core Program must comply with the requirements...

  17. Electric Field-Assisted Photochemical Water Splitting Should Operate with 287 nm Light.

    PubMed

    Bachler, Vinzenz; Gärtner, Wolfgang

    2016-05-01

    The major photoreaction of water is the homolytic splitting of one O-H bond starting from the 1(1) B1 excited state (λmax = 167 nm). This reaction produces H• and •OH radicals. The combination of two H• atoms leads to the potential energy carrier dihydrogen. However, the energy required to obtain the photoreactive 1(1) B1 electronic state is about 7.4 eV, which cannot be effectively provided by solar radiation. The sun light spectrum on earth comprises the visible and ultraviolet region, but shows vanishing intensity near 7 eV (177.1 nm). This work provides theoretical evidence that the photoreactive 1(1) B1 state of water can be shifted into the ultraviolet (UV-B) light region (≈287 nm) by including explicitly an electric field in the calculations of the water absorption spectrum. To accomplish such bathochromic shift, a large field strength of 3.08 VÅ(-1) is required. The field-dependent excitation energies were calculated by applying the symmetry-adapted cluster configuration interaction (SAC-CI) procedure. Based on this theoretical analysis, we propose that photochemical water splitting can be accomplished by means of 287 nm light provided the water molecule is favorably oriented by an external electric field and is subsequently activated by a reversal of the field orientation. PMID:26876336

  18. Fabricating vertically aligned sub-20 nm Si nanowire arrays by chemical etching and thermal oxidation

    NASA Astrophysics Data System (ADS)

    Li, Luping; Fang, Yin; Xu, Cheng; Zhao, Yang; Zang, Nanzhi; Jiang, Peng; Ziegler, Kirk J.

    2016-04-01

    Silicon nanowires (SiNWs) are appealing building blocks in various applications, including photovoltaics, photonics, and sensors. Fabricating SiNW arrays with diameters <100 nm remains challenging through conventional top-down approaches. In this work, chemical etching and thermal oxidation are combined to fabricate vertically aligned, sub-20 nm SiNW arrays. Defect-free SiNWs with diameters between 95 and 200 nm are first fabricated by nanosphere (NS) lithography and chemical etching. The key aspects for defect-free SiNW fabrication are identified as: (1) achieving a high etching selectivity during NS size reduction; (2) retaining the circular NS shape with smooth sidewalls; and (3) using a directional metal deposition technique. SiNWs with identical spacing but variable diameters are demonstrated by changing the reactive ion etching power. The diameter of the SiNWs is reduced by thermal oxidation, where self-limiting oxidation is encountered after oxidizing the SiNWs at 950 °C for 1 h. A second oxidation is performed to achieve vertically aligned, sub-20 nm SiNW arrays. Si/SiO2 core/shell NWs are obtained before removing the oxidized shell. HRTEM imaging shows that the SiNWs have excellent crystallinity.

  19. Implementation of templated DSA for via layer patterning at the 7nm node

    NASA Astrophysics Data System (ADS)

    Gronheid, Roel; Doise, Jan; Bekaert, Joost; Chan, Boon Teik; Karageorgos, Ioannis; Ryckaert, Julien; Vandenberghe, Geert; Cao, Yi; Lin, Guanyang; Somervell, Mark; Fenger, Germain; Fuchimoto, Daisuke

    2015-03-01

    In recent years major advancements have been made in the directed self-assembly (DSA) of block copolymers (BCP). Insertion of DSA for IC fabrication is seriously considered for the 7nm node. At this node the DSA technology could alleviate costs for double patterning and limit the number of masks that would be required per layer. At imec multiple approaches for inserting DSA into the 7nm node are considered. One of the most straightforward approaches for implementation would be for via patterning through templated DSA (grapho-epitaxy), since hole patterns are readily accessible through templated hole patterning of cylindrical phase BCP materials. Here, the pre-pattern template is first patterned into a spin-on hardmask stack. After optimizing the surface properties of the template the desired hole patterns can be obtained by the BCP DSA process. For implementation of this approach to be implemented for 7nm node via patterning, not only the appropriate process flow needs to be available, but also appropriate metrology (including for pattern placement accuracy) and DSA-aware mask decomposition are required. In this paper the imec approach for 7nm node via patterning will be discussed.

  20. Segmentation of 830- and 1310-nm LASIK corneal optical coherence tomography images

    NASA Astrophysics Data System (ADS)

    Li, Yan; Shekhar, Raj; Huang, David

    2002-05-01

    Optical coherence tomography (OCT) provides a non-contact and non-invasive means to visualize the corneal anatomy at micron scale resolution. We obtained corneal images from an arc-scanning (converging) OCT system operating at a wavelength of 830nm and a fan-shaped-scanning high-speed OCT system with an operating wavelength of 1310nm. Different scan protocols (arc/fan) and data acquisition rates, as well as wavelength dependent bio-tissue backscatter contrast and optical absorption, make the images acquired using the two systems different. We developed image-processing algorithms to automatically detect the air-tear interface, epithelium-Bowman's layer interface, laser in-situ keratomileusis (LASIK) flap interface, and the cornea-aqueous interface in both kinds of images. The overall segmentation scheme for 830nm and 1310nm OCT images was similar, although different strategies were adopted for specific processing approaches. Ultrasound pachymetry measurements of the corneal thickness and Placido-ring based corneal topography measurements of the corneal curvature were made on the same day as the OCT examination. Anterior/posterior corneal surface curvature measurement with OCT was also investigated. Results showed that automated segmentation of OCT images could evaluate anatomic outcome of LASIK surgery.

  1. Imaging of electrical response of NiOx under controlled environment with sub-25-nm resolution

    DOE PAGESBeta

    Jacobs, Christopher B.; Ievlev, Anton V.; Collins, Liam F.; Muckley, Eric S.; Joshi, Pooran C.; Ivanov, Ilia N.

    2016-07-19

    The spatially resolved electrical response of rf-sputtered polycrystalline NiOx films composed of 40 nm crystallites was investigated under different relative humidity levels (RH). The topological and electrical properties (surface potential and resistance) were characterized using Kelvin probe force microscopy (KPFM) and conductive scanning probe microscopy at 0%, 50%, and 80% relative humidity with sub 25nm resolution. The surface potential of NiOx decreased by about 180 mV and resistance decreased in a nonlinear fashion by about 2 G when relative humidity was increased from 0% to 80%. The dimensionality of surface features obtained through autocorrelation analysis of topological, surface potential andmore » resistance maps increased linearly with increased relative humidity as water was adsorbed onto the film surface. Spatially resolved surface potential and resistance of the NiOx films were found to be heterogeneous, with distinct features that grew in size from about 60 nm to 175 nm between 0% and 80% RH levels, respectively. Here, we find that the changes in the heterogeneous character of the NiO films are consistent through the topological, surface potential, and resistance measurements, suggesting that the nanoscale surface potential and resistance properties converge with the mesoscale properties as water is adsorbed onto the NiOx film.« less

  2. Efficient methylammonium lead iodide perovskite solar cells with active layers from 300 to 900 nm

    SciTech Connect

    Momblona, C.; Malinkiewicz, O.; Soriano, A.; Gil-Escrig, L.; Bandiello, E.; Scheepers, M.; Bolink, H. J.; Edri, E.

    2014-08-01

    Efficient methylammonium lead iodide perovskite-based solar cells have been prepared in which the perovskite layer is sandwiched in between two organic charge transporting layers that block holes and electrons, respectively. This configuration leads to stable and reproducible devices that do not suffer from strong hysteresis effects and when optimized lead to efficiencies close to 15%. The perovskite layer is formed by using a dual-source thermal evaporation method, whereas the organic layers are processed from solution. The dual-source thermal evaporation method leads to smooth films and allows for high precision thickness variations. Devices were prepared with perovskite layer thicknesses ranging from 160 to 900 nm. The short-circuit current observed for these devices increased with increasing perovskite layer thickness. The main parameter that decreases with increasing perovskite layer thickness is the fill factor and as a result optimum device performance is obtained for perovskite layer thickness around 300 nm. However, here we demonstrate that with a slightly oxidized electron blocking layer the fill factor for the solar cells with a perovskite layer thickness of 900 nm increases to the same values as for the devices with thin perovskite layers. As a result the power conversion efficiencies for the cells with 300 and 900 nm are very similar, 12.7% and 12%, respectively.

  3. Solar Spectral Irradiance at 782 nm as Measured by the SES Sensor Onboard Picard

    NASA Astrophysics Data System (ADS)

    Meftah, M.; Hauchecorne, A.; Irbah, A.; Cessateur, G.; Bekki, S.; Damé, L.; Bolsée, D.; Pereira, N.

    2016-04-01

    Picard is a satellite dedicated to the simultaneous measurement of the total and solar spectral irradiance, the solar diameter, the solar shape, and to the Sun's interior through the methods of helioseismology. The satellite was launched on June 15, 2010, and pursued its data acquisitions until March 2014. A Sun Ecartometry Sensor (SES) was developed to provide the stringent pointing requirements of the satellite. The SES sensor produced an image of the Sun at 782 ± 2.5 nm. From the SES data, we obtained a new time series of the solar spectral irradiance at 782 nm from 2010 to 2014. During this period of Solar Cycle 24, the amplitude of the changes has been of the order of ± 0.08 %, corresponding to a range of about 2× 10^{-3} W m^{-2} nm^{-1}. SES observations provided a qualitatively consistent evolution of the solar spectral irradiance variability at 782 nm. SES data show similar amplitude variations with the semi-empirical model Spectral And Total Irradiance REconstruction for the Satellite era (SATIRE-S), whereas the Spectral Irradiance Monitor instrument (SIM) onboard the SOlar Radiation and Climate Experiment satellite (SORCE) highlights higher amplitudes.

  4. Fabricating vertically aligned sub-20 nm Si nanowire arrays by chemical etching and thermal oxidation.

    PubMed

    Li, Luping; Fang, Yin; Xu, Cheng; Zhao, Yang; Zang, Nanzhi; Jiang, Peng; Ziegler, Kirk J

    2016-04-22

    Silicon nanowires (SiNWs) are appealing building blocks in various applications, including photovoltaics, photonics, and sensors. Fabricating SiNW arrays with diameters <100 nm remains challenging through conventional top-down approaches. In this work, chemical etching and thermal oxidation are combined to fabricate vertically aligned, sub-20 nm SiNW arrays. Defect-free SiNWs with diameters between 95 and 200 nm are first fabricated by nanosphere (NS) lithography and chemical etching. The key aspects for defect-free SiNW fabrication are identified as: (1) achieving a high etching selectivity during NS size reduction; (2) retaining the circular NS shape with smooth sidewalls; and (3) using a directional metal deposition technique. SiNWs with identical spacing but variable diameters are demonstrated by changing the reactive ion etching power. The diameter of the SiNWs is reduced by thermal oxidation, where self-limiting oxidation is encountered after oxidizing the SiNWs at 950 °C for 1 h. A second oxidation is performed to achieve vertically aligned, sub-20 nm SiNW arrays. Si/SiO2 core/shell NWs are obtained before removing the oxidized shell. HRTEM imaging shows that the SiNWs have excellent crystallinity. PMID:26953775

  5. Efficient generation of 509 nm light by sum-frequency mixing between two tapered diode lasers

    NASA Astrophysics Data System (ADS)

    Tawfieq, Mahmoud; Jensen, Ole Bjarlin; Hansen, Anders Kragh; Sumpf, Bernd; Paschke, Katrin; Andersen, Peter E.

    2015-03-01

    We demonstrate a concept for visible laser sources based on sum-frequency generation of beam combined tapered diode lasers. In this specific case, a 1.7 W sum-frequency generated green laser at 509 nm is obtained, by frequency adding of 6.17 W from a 978 nm tapered diode laser with 8.06 W from a 1063 nm tapered diode laser, inside a periodically poled MgO doped lithium niobate crystal. This corresponds to an optical to optical conversion efficiency of 12.1%. As an example of potential applications, the generated nearly diffraction-limited green light is used for pumping a Ti:sapphire laser, thus demonstrating good beam quality and power stability. The maximum output powers achieved when pumping the Ti:sapphire laser are 226 mW (CW) and 185 mW (mode-locked) at 1.7 W green pump power. The optical spectrum emitted by the mode-locked Ti:sapphire laser shows a spectral width of about 54 nm (FWHM), indicating less than 20 fs pulse width.

  6. 490-nm generation by sum-frequency mixing of diode pumped Nd:GdVO4-Nd:YLF lasers

    NASA Astrophysics Data System (ADS)

    Li, C. L.; Cai, H. X.; Xu, L. J.; Tan, Y.; Jin, G. Y.; Bi, J.

    2011-07-01

    We report a continuous-wave (CW) blue laser emission by sum-frequency mixing in Nd:GdVO4 and Nd:YLF crystals. Using type-I critical phase-matching (CPM) LBO crystal, a blue laser at 490 nm is obtained by 1063 and 908 nm intracavity sum-frequency mixing. The maximum laser output power of 118 mW is obtained when an incident pump laser of 18.2 W is used. At the output power level of 118 mW, the output stability is better than 4.2%.

  7. NM23 protein in neoplastic and nonneoplastic thyroid tissues.

    PubMed Central

    Bertheau, P.; De La Rosa, A.; Steeg, P. S.; Merino, M. J.

    1994-01-01

    The expression of nm23 gene products has been associated with a lower metastatic potential and better outcome in malignant tumors. We have used immunohistochemistry to study the expression of nm23 protein in thyroid tissues from 101 patients consisting of 78 malignant neoplasms, 13 adenomas, and 10 other benign conditions. Cytoplasmic staining for nm23 protein was identified in normal tissues and in most benign and malignant lesions and did not correlate with either histological type of clinical outcome. Nuclear staining was seen in 93% of normal tissues and in 29% of primary carcinomas of the thyroid and was associated with a longer disease-free survival (P = 0.03). Membranous staining was present in some tumors but absent in normal thyroid. In conclusion, nm23 protein has a combined pattern of distribution among subcellular compartments in thyroid tissues. Although there was no significant association between cytoplasmic or membranous expression and histological type of tumor or survival nm23 nuclear expression may be a useful marker in assessing the evolution of thyroid tumors. Images Figure 1 PMID:8030752

  8. Absorption spectrum of DNA for wavelengths greater than 300 nm

    SciTech Connect

    Sutherland, J.C.; Griffin, K.P.

    1981-06-01

    Although DNA absorption at wavelengths greater than 300 nm is much weaker than that at shorter wavelengths, this absorption seems to be responsible for much of the biological damage caused by solar radiation of wavelengths less than 320 nm. Accurate measurement of the absorption spectrum of DNA above 300 nm is complicated by turbidity characteristic of concentrated solutions of DNA. We have measured the absorption spectra of DNA from calf thymus, Clostridium perfringens, Escherichia coli, Micrococcus luteus, salmon testis, and human placenta using procedures which separate optical density due to true absorption from that due to turbidity. Above 300 nm, the relative absorption of DNA increases as a function of guanine-cytosine content, presumably because the absorption of guanine is much greater than the absorption of adenine at these wavelengths. This result suggests that the photophysical processes which follow absorption of a long-wavelength photon may, on the average, differ from those induced by shorter-wavelength photons. It may also explain the lower quantum yield for the killing of cells by wavelengths above 300 nm compared to that by shorter wavelengths.

  9. Taking the X Architecture to the 65-nm technology node

    NASA Astrophysics Data System (ADS)

    Sarma, Robin C.; Smayling, Michael C.; Arora, Narain; Nagata, Toshiyuki; Duane, Michael P.; Shah, Santosh; Keston, Harris J.; Oemardani, Shiany

    2004-05-01

    The X Architecture is a new way of orienting the interconnect on an integrated circuit using diagonal pathways, as well as the traditional right-angle, or Manhattan, configuration. By enabling designs with significantly less wire and fewer vias, the X Architecture can provide substantial improvements in chip performance, power consumption and cost. Members of the X Initiative semiconductor supply chain consortium have demonstrated the production worthiness of the X Architecture at the 130-nm and 90-nm process technology nodes. This paper presents an assessment of the manufacturing readiness of the X Architecture for the 65-nm technology node. The extent to which current production capabilities in mask writing, lithography, wafer processing, inspection and metrology can be used is discussed using the results from a 65-nm test chip. The project was a collaborative effort amongst a number of companies in the IC fabrication supply chain. Applied Materials fabricated the 65-nm X Architecture test chip at its Maydan Technology Center and leveraged the technology of other X Initiative members. Cadence Design Systems provided the test structure design and chip validation tools, Dai Nippon Printing produced the masks and Canon"s imaging system was employed for the photolithography.

  10. Extreme ultraviolet mask defect inspection with a half pitch 16-nm node using simulated projection electron microscope images

    NASA Astrophysics Data System (ADS)

    Iida, Susumu; Amano, Tsuyoshi; Hirano, Ryoichi; Terasawa, Tsuneo; Watanabe, Hidehiro

    2013-04-01

    According to an International Technology Roadmap for Semiconductors (ITRS-2012) update, the sensitivity requirement for an extreme ultraviolet (EUV) mask pattern inspection system is to be less than 18 nm for half pitch (hp) 16-nm node devices. The inspection sensitivity of extrusion and intrusion defects on hp 64-nm line-and-space patterned EUV mask were investigated using simulated projection electron microscope (PEM) images. The obtained defect images showed that the optimization of current density and image processing techniques were essential for the detection of defects. Extrusion and intrusion defects 16 nm in size were detected on images formed by 3000 electrons per pixel. The landing energy also greatly influenced the defect detection efficiency. These influences were different for extrusion and intrusion defects. These results were in good agreement with experimentally obtained yield curves of the mask materials and the elevation angles of the defects. These results suggest that the PEM technique has a potential to detect 16-nm size defects on an hp 64-nm patterned EUV mask.

  11. Comparison of modeled NmE with NmE measured by the Boulder ionosonde near the spring equinox.

    NASA Astrophysics Data System (ADS)

    Pavlov, Anatoli; Pavlova, Nadezhda

    We present a comparison of the E-layer peak electron number densities, NmE, measured by the Boulder ionosonde during geomagnetically quiet conditions on 10 April 1996 at low solar activity, 2 April 1993 and 9 April 1978 during moderate solar activity conditions, and 10 April 1991 at high solar activity with numerical theoretical model calculations of NmE. Based on this comparison, the modified EUVAC model solar flux is necessary to increase by a factor of 2 at moderate and high solar activity in the wavelength range of 3.2-7.0 nm. If O (+) ( (4) S), O (+) ( (2) D), O (+) ( (2) P), and N (+) ions are not calculated, the value of NmE is decreased up to a factor of 1.12 at solar minimum and up to a factor of 1.23 for the moderate and high solar activity conditions. The production of N _{2} (+) ions by photoelectron-impact ionization of N _{2} increases the value of NmE up to a factor of 1.18 at low solar activity and up to a factor of 1.33 for the moderate and high solar activity levels. The increase in NmE due to the production of O _{2} (+) ions by photoelectron-impact ionization of O _{2} does not exceed 4 percent. A difference between the calculated electron, T _{e}, and neutral, T _{n}, temperatures is less than 1, 4, 20, 70, and 145 K at 105, 110, 120, 130, and 140 km altitude, respectively. Changes in NmE caused by this difference between T _{e} and T _{n} are negligible.

  12. Absorption cross section measurements of oxygen in the wavelength region 195-241 nm of the Herzberg continuum

    NASA Technical Reports Server (NTRS)

    Cheung, A. S.-C.; Yoshino, K.; Parkinson, W. H.; Freeman, D. E.; Guberman, S. L.

    1986-01-01

    The continuous absorption cross section of oxygen in the region 205-241 nm is studied as a function of path length and oxygen pressure. The technique used to study the continuous absorption cross section is described. Cross section measurements of oxygen in the wavelength region 193-205 nm obtained by Cheung et al. (1984) are applied in this experiment. The measured cross section is analyzed in terms of a Herzberg continuum and a pressure-dependent continuum. The total measured continuum cross section, the cross section involving two molecules of O2, and the Herzberg continuum absorption cross section values are calculated. It is observed that the Herzberg continuum cross section of oxygen values measured at 1 nm intervals in the region 195-241 nm, increase from 6.3 x 10 to the -24th sq cm at 195 nm to a maximum of 6.6 x 10 to the -24th sq cm at 201 nm and then decrease to 0.85 x 10 to the -24th sq cm at 241 nm. The Herzberg values are compared with data from previous investigations and the values correlate well.

  13. Interannual variations of the mid-latitude 557.7 nm atmosphere emission within the solar cycle

    NASA Astrophysics Data System (ADS)

    Mikhalev, Alexander

    Variations of the 557.7 nm airglow intensity (emitting layer height is 85-115 km) in the 23- rd solar cycle are analyzed. The experimental data of the 557.7 nm atomic oxygen emission obtained at ISTP Geophysical observatory near Irkutsk (52 N, 103 E) are used. The feature of observed 557.7 nm intensity variations is an infringement of direct correlation dependence between the emission intensity and solar activity level (F10.7) in separate years. Also the results received in the 18th-22d solar cycles at the other mid-latitude stations are analyzed. It is revealed, that the features of the long-term variations of 557.7 nm intensity in the 23-rd and 20-th solar cycles are the most similar. There are some solar cycles in which the phase synchronism of 557.7 nm emission variations with 11-years cycle of solar activity is broken. In these cycles the periods about 4-6 years in 557.7 nm emission variations are dominant. The possible reasons of interannual variations of 557.7 nm atmospheric emission associated with the influence of lower atmosphere are discussed. This work was done under RAS Presidium Program 16 (Part 3) and joint Russian-Bulgarian Atmos project support.

  14. Guaranteed discovery of the NmSuGra model

    SciTech Connect

    Balazs, Csaba; Carter, Daniel

    2008-11-23

    We analyze the discovery potential of the next-to-minimal supergravity motivated model: NmSuGra. This model is an extension of mSuGra by a gauge singlet, and contains only one additional parameter: {lambda}, the Higgs-singlet-Higgs coupling. NmSuGra solves the {mu}-problem and reduces the fine tuning of mSuGra. After identifying parameter space regions preferred by present experimental data, we show that these regions of NmSuGra are amenable to detection by the combination of the Large Hadron Collider and an upgraded Cryogenic Dark Matter Search. This conclusion holds strictly provided that the more than three sigma discrepancy in the difference of the experimental and the standard theoretical values of the anomalous magnetic moment of the muon prevails in the future.

  15. Sub-5 nm, globally aligned graphene nanoribbons on Ge(001)

    NASA Astrophysics Data System (ADS)

    Kiraly, Brian; Mannix, Andrew J.; Jacobberger, Robert M.; Fisher, Brandon L.; Arnold, Michael S.; Hersam, Mark C.; Guisinger, Nathan P.

    2016-05-01

    Graphene nanoribbons (GNRs) hold great promise for future electronics because of their edge and width dependent electronic bandgaps and exceptional transport properties. While significant progress toward GNR devices has been made, the field has been limited by difficulties achieving narrow widths, global alignment, and atomically pristine GNR edges on technologically relevant substrates. A recent advance has challenged these limits by using Ge(001) substrates to direct the bottom-up growth of GNRs with nearly pristine armchair edges and widths near ˜10 nm via atmospheric pressure chemical vapor deposition. In this work, the growth of GNRs on Ge(001) is extended to ultra-high vacuum conditions, resulting in the realization of GNRs with widths narrower than 5 nm. Armchair graphene nanoribbons oriented along Ge <110> surface directions are achieved with excellent width control and relatively large bandgaps. The bandgap magnitude and electronic uniformity of these sub-5 nm GNRs are well-suited for emerging nanoelectronic applications.

  16. Composition of 15-85 nm particles in marine air

    NASA Astrophysics Data System (ADS)

    Lawler, M. J.; Whitehead, J.; O'Dowd, C.; Monahan, C.; McFiggans, G.; Smith, J. N.

    2014-11-01

    The chemical composition of 15-85 nm diameter particles was measured at Mace Head, Ireland, during May 2011 using the TDCIMS (thermal desorption chemical ionization mass spectrometer). Measurable levels of chloride, sodium, and sulfate were present in essentially all collected samples of these particles at this coastal Atlantic site. Acetaldehyde and benzoic acid were also frequently detected. Concomitant particle hygroscopicity observations usually showed a sea-salt mode and a lower hygroscopicity mode with growth factors near to that of ammonium sulfate. There were many periods lasting from hours to about 2 days during which the 10-60 nm particle number increased dramatically in polar oceanic air. These periods were correlated with the presence of benzoic acid in the particles and an increase in the number of lower hygroscopicity mode particles. Very small (< 10 nm) particles were also present, suggesting that new particle formation contributed to these nanoparticle enhancement events.

  17. Developmental Function of Nm23/awd - A Mediator of Endocytosis

    PubMed Central

    Nallamothu, Gouthami; Dammai, Vincent; Hsu, Tien

    2009-01-01

    The metastasis suppressor gene Nm23 is highly conserved from yeast to human, implicating a critical developmental function. Studies in cultured mammalian cells have identified several potential functions, but many have not been directly verified in vivo. Here we summarize the studies on the Drosophila homologue of the Nm23 gene, named abnormal wing discs (awd), which shares 78% amino acid identity with the human Nm23-H1 and H2 isoforms. These studies confirmed that awd gene encodes a nucleoside diphosphate kinase, and provided strong evidence of a role for awd in regulating cell differentiation and motility via regulation of growth factor receptor signaling. The latter function is mainly mediated by control of endocytosis. This review provides a historical account of the discovery and subsequent analyses of the awd gene. We will also discuss the possible molecular function of the Awd protein that underlies the endocytic function. PMID:19373545

  18. High power narrowband 589 nm frequency doubled fibre laser source.

    PubMed

    Taylor, Luke; Feng, Yan; Calia, Domenico Bonaccini

    2009-08-17

    We demonstrate high-power high-efficiency cavity-enhanced second harmonic generation of an in-house built ultra-high spectral density (SBS-suppressed) 1178 nm narrowband Raman fibre amplifier. Up to 14.5 W 589 nm CW emission is achieved with linewidth Delta nu(589) < 7 MHz in a diffraction-limited beam, with peak external conversion efficiency of 86%. The inherently high spectral and spatial qualities of the 589 nm source are particularly suited to both spectroscopic and Laser Guide Star applications, given the seed laser can be easily frequency-locked to the Na D(2a) emission line. Further, we expect the technology to be extendable, at similar or higher powers, to wavelengths limited only by the seed-pump-pair availability. PMID:19687946

  19. New Vector Spectropolarimetry of Sunspots near 4000nm

    NASA Astrophysics Data System (ADS)

    Penn, Matthew J.; Coulter, Roy; Goode, Philip R.

    2014-06-01

    Magnetic sensitivity of spectral lines increases as the product of the wavelength and the Lande g-factor. While the most magnetically sensitive spectral line known is the Mg I 12318nm line, and observations are often made near 1600nm, little work has been done using solar spectral lines near 4000nmWe report on new solar spectropolarimetric observations at these wavelengths, made at the NSO McMath-Pierce facility with the NAC and at the NJIT New Solar Telescope using CYRA. Several photospheric absorption lines have been used to map a sunspot magnetic field, and molecular line Zeeman splitting has also been observed. Several "negative-g" molecular lines are seen, and an atomic line shows unusual profiles.

  20. High Power 938nm Cladding Pumped Fiber Laser

    SciTech Connect

    Dawson, J; Beach, R; Brobshoff, A; Liao, Z; Payne, S; Pennington, D; Taylor, L; Hackenberg, W; Bonaccini, D

    2002-12-26

    We have developed a Nd:doped cladding pumped fiber amplifier, which operates at 938nm with greater than 2W of output power. The core co-dopants were specifically chosen to enhance emission at 938nm. The fiber was liquid nitrogen cooled in order to achieve four-level laser operation on a laser transition that is normally three level at room temperature, thus permitting efficient cladding pumping of the amplifier. Wavelength selective attenuation was induced by bending the fiber around a mandrel, which permitted near complete suppression of amplified spontaneous emission at 1088nm. We are presently seeking to scale the output of this laser to 10W. We will discuss the fiber and laser design issues involved in scaling the laser to the 10W power level and present our most recent results.

  1. Porcine dermal lesions produced by 1540-nm laser radiation pulses

    NASA Astrophysics Data System (ADS)

    Roach, William P.; Johnson, Thomas E.

    2001-07-01

    Completion of recent studies within our group indicates a breed-based difference in dermal response to 1540 nm 0.8 millisecond laser pulses. Laser exposure to Yucatan Mini- Pigs (highly pigmented skin) and Yorkshire pigs (lightly pigmented skin) demonstrate statistical differences between the ED50's of the two breeds. Laser delivery is accomplished using an Er:Glass system producing 1540 nm of light at millisecond exposure times and in the range of 5 to 95 J/cm2. Dermal lesion development was evaluated for acute, 1 hour, and 24-hour post exposure presentation. Our data contradicts the theory that water absorption is the sole mechanism of dermal tissue damage observed from 1540 nm laser exposures, as skin chromophores appear to play a role in lesion development.

  2. Improved overlay metrology device correlation on 90-nm logic processes

    NASA Astrophysics Data System (ADS)

    Ueno, Atsushi; Tsujita, Kouichirou; Kurita, Hiroyuki; Iwata, Yasuhisa; Ghinovker, Mark; Poplawski, Jorge M.; Kassel, Elyakim; Adel, Mike E.

    2004-05-01

    Isolated and dense patterns were formed at process layers from gate through to back-end on wafers using a 90 nm logic device process utilizing ArF lithography under various lithography conditions. Pattern placement errors (PPE) between AIM grating and BiB marks were characterized for line widths varying from 1000nm to 140nm. As pattern size was reduced, overlay discrepancies became larger, a tendency which was confirmed by optical simulation with simple coma aberration. Furthermore, incorporating such small patterns into conventional marks resulted in significant degradation in metrology performance while performance on small pattern segmented grating marks was excellent. Finally, the data also show good correlation between the grating mark and specialized design rule feature SEM marks, with poorer correlation between conventional mark and SEM mark confirming that new grating mark significantly improves overlay metrology correlation with device patterns.

  3. Full-field imprinting of sub-40 nm patterns

    NASA Astrophysics Data System (ADS)

    Yeo, Jeongho; Kim, Hoyeon; Eynon, Ben

    2008-03-01

    Imprint lithography has been included on the ITRS Lithography Roadmap at the 32, 22 and 16 nm nodes. Step and Flash Imprint Lithography (S-FIL (R)) is a unique patterning method that has been designed from the beginning to enable precise overlay to enable multilevel device fabrication. A photocurable low viscosity resist is dispensed dropwise to match the pattern density requirements of the device, thus enabling patterning with a uniform residual layer thickness across a field and across multiple wafers. Further, S-FIL provides sub-50 nm feature resolution without the significant expense of multi-element projection optics or advanced illumination sources. However, since the technology is 1X, it is critical to address the infrastructure associated with the fabrication of imprint masks (templates). For sub-32 nm device manufacturing, one of the major technical challenges remains the fabrication of full-field 1x imprint masks with commercially viable write times. Recent progress in the writing of sub-40 nm patterns using commercial variable shape e-beam tools and non-chemically amplified resists has demonstrated a very promising route to realizing these objectives, and in doing so, has considerably strengthened imprint lithography as a competitive manufacturing technology for the sub-32nm node. Here we report the first imprinting results from sub-40 nm full-field patterns, using Samsung's current flash memory production device design. The fabrication of the imprint mask and the resulting critical dimension control and uniformity are discussed, along with image placement results. The imprinting results are described in terms of CD uniformity, etch results, and overlay.

  4. 32 nm imprint masks using variable shape beam pattern generators

    NASA Astrophysics Data System (ADS)

    Selinidis, Kosta; Thompson, Ecron; Schmid, Gerard; Stacey, Nick; Perez, Joseph; Maltabes, John; Resnick, Douglas J.; Yeo, Jeongho; Kim, Hoyeon; Eynon, Ben

    2008-05-01

    Imprint lithography has been included on the ITRS Lithography Roadmap at the 32, 22 and 16 nm nodes. Step and Flash Imprint Lithography (S-FIL ®) is a unique method that has been designed from the beginning to enable precise overlay for creating multilevel devices. A photocurable low viscosity monomer is dispensed dropwise to meet the pattern density requirements of the device, thus enabling imprint patterning with a uniform residual layer across a field and across entire wafers. Further, S-FIL provides sub-100 nm feature resolution without the significant expense of multi-element, high quality projection optics or advanced illumination sources. However, since the technology is 1X, it is critical to address the infrastructure associated with the fabrication of templates. For sub-32 nm device manufacturing, one of the major technical challenges remains the fabrication of full-field 1x templates with commercially viable write times. Recent progress in the writing of sub-40 nm patterns using commercial variable shape e-beam tools and non-chemically amplified resists has demonstrated a very promising route to realizing these objectives, and in doing so, has considerably strengthened imprint lithography as a competitive manufacturing technology for the sub 32nm node. Here we report the first imprinting results from sub-40 nm full-field patterns, using Samsung's current flash memory production device design. The fabrication of the template is discussed and the resulting critical dimension control and uniformity are discussed, along with image placement results. The imprinting results are described in terms of CD uniformity, etch results, and overlay.

  5. Full phase-shifting methodology for 65-nm node lithography

    NASA Astrophysics Data System (ADS)

    Pierrat, Christophe; Driessen, Frank A. J. M.; Vandenberghe, Geert

    2003-06-01

    A new methodology for completely phase-shifting a poly layout without creating local phase conflicts was proposed for lithographic techniques combining one phase-shifting mask and one binary mask exposure1. Critical and non-critical areas of the layout are identified and phase conflicts are avoided by splitting the shifter regions from non-critical areas to non-critical areas without crossing critical areas. The out-of-phase splits of the shifter regions are removed using the binary exposure. Simulation results and experimental data collected for 90nm technology node show no sign of process latitude loss around the areas where the shifters are split. The overlay latitude is commensurate with 90nm technology scanner requirements (tool to itself). Simulation work shows that the two exposures are balancing each other out of focus in the 45-degree cut regions thus ensuring large focus latitude. The focus latitude reported is larger than the main feature process latitude; this result was confirmed experimentally. A set of phase-shifting design rules commensurate with an aggressive 65nm node technology (140nm pitch) was put together. Under these conditions, we have identified certain types of cuts that should be avoided during the generation of the phase-shifting layout; this is primarily the case for cuts in "elbow" structures which exhibit limited process latitude. Other cuts like line-end cuts will have to be modified. In this case we have proposed a side cut when the line-end is facing a perpendicular line with a minimum spacing. Despite these restrictions, test structures for the 65nm technology node were successfully converted with no phase conflicts. Experimental verification done on test structures using a 0.75 NA, 193nm scanner demonstrates 0.33 k1 capability using the full phase methodology.

  6. Comparison of 265 nm Femtosecond and 213 nm Nanosecond Laser Ablation Inductively Coupled Plasma Mass Spectrometry for Pb Isotope Ratio Measurements.

    PubMed

    Ohata, Masaki; Nonose, Naoko; Dorta, Ladina; Günther, Detlef

    2015-01-01

    The analytical performance of 265 nm femtosecond laser ablation (fs-LA) and 213 nm nanosecond laser ablation (ns-LA) systems coupled with multi-collector inductively coupled plasma mass spectrometry (MC-ICPMS) for Pb isotope ratio measurements of solder were compared. Although the time-resolved signals of Pb measured by fs-LA-MC-ICPMS showed smoother signals compared to those obtained by ns-LA-MC-ICPMS, similar precisions on Pb isotope ratio measurements were obtained between them, even though their operating conditions were slightly different. The mass bias correction of the Pb isotope ratio measurement was carried out by a comparison method using a Pb standard solution prepared from NIST SRM 981 Pb metal isotopic standard, which was introduced into the ICP by a desolvation nebulizer (DSN) via a dual-sample introduction system, and it was successfully demonstrated for Pb isotope ratio measurements for either NIST 981 metal isotopic standard or solder by fs-LA-MC-ICPMS since the analytical results agreed well with the certified value as well as the determined value within their standard deviations obtained and the expanded uncertainty of the certified or determined value. The Pb isotope ratios of solder obtained by ns-LA-MC-ICPMS also showed agreement with respect to the determined value within their standard deviations and expanded uncertainty. From these results, it was evaluated that the mass bias correction applied in the present study was useful and both LA-MC-ICPMS could show similar analytical performance for the Pb isotope ratio microanalysis of metallic samples such as solder. PMID:26656823

  7. High-energy directly diode-pumped Q-switched 1617 nm Er:YAG laser at room temperature.

    PubMed

    Wang, Mingjian; Zhu, Liang; Chen, Weibiao; Fan, Dianyuan

    2012-09-01

    We describe high-energy Erbium-doped yttrium aluminum garnet (Er:YAG) lasers operating at 1617 nm, resonantly pumped using 1532 nm fiber-coupled laser diodes. A maximum continuous wave output power of 4.3 W at 1617 nm was achieved with an output coupler of 20% transmission under incident pump power of 29.7 W, resulting in an optical conversion of 14% with respect to the incident pump power. In Q-switched operation, the pulse energy of 11.8 mJ at 100 Hz pulse repetition frequency and 81 ns pulse duration was obtained. This energy is the highest pulse energy reported for a directly diode-pumped Q-switched Er:YAG laser operating at 1617 nm. PMID:22941006

  8. Achievement of an efficient 1053 nm Nd:YLF polarized laser based on different thermal lensing effects

    NASA Astrophysics Data System (ADS)

    Wei, Yong; Xu, Shan; Huang, Chenghui; Chen, Weidong; Zhuang, Fengjiang; Huang, Lingxiong; Chen, Zhenqiang; Zhang, Ge

    2012-09-01

    The negative and positive thermal focal lengths for 1047 nm and 1053 nm were respectively demonstrated through analyzing different thermal lensing effects along the π- and σ-polarizations in a plane-parallel resonator. A compact and efficient diode-end-pumped 1053 nm Nd:YLF polarized laser is presented. As high as 11.2 W output power of the polarized 1053 nm laser has been obtained at an absorbed pump power of 22.3 W with an optical-optical efficiency of 50% and a slope efficiency of 53%. With the aid of a ray propagation matrix and a λ/4 wave plate, different thermal lensing effects for the π- and σ-polarizations have been theoretically analyzed and experimentally verified.

  9. Facile Synthesis of Sub-20 nm Silver Nanowires through a Bromide-Mediated Polyol Method.

    PubMed

    da Silva, Robson Rosa; Yang, Miaoxin; Choi, Sang-Il; Chi, Miaofang; Luo, Ming; Zhang, Chao; Li, Zhi-Yuan; Camargo, Pedro H C; Ribeiro, Sidney José Lima; Xia, Younan

    2016-08-23

    Essentially all of the Ag nanowires reported in the literature have sizes larger than 30 nm in diameter. In this article, we report a simple and robust approach to the synthesis of Ag nanowires with diameters below 20 nm and aspect ratios over 1000 using a one-pot polyol method. The Ag nanowires took a penta-twinned structure, and they could be obtained rapidly (<35 min) and in high morphology purity (>85% of the as-obtained solid product) under atmospheric pressure. The key to the success of this synthesis is to restrain the nanowires from lateral growth by employing both Br(-) ions and poly(vinylpyrrolidone) with a high molecular weight of 1 300 000 g/mol to cap the {100} side faces, together with the use of a syringe pump to slowly introduce AgNO3 into the reaction solution. By optimizing the ratios between the capping agents and AgNO3, we were able to slow down the reduction kinetics and effectively direct the Ag nanowires to grow along the longitudinal direction only. The nanowires showed great mechanical flexibility and could be bent with acute angles without breaking. Because of their small diameters, the transverse localized surface plasmon resonance peak of the Ag nanowires could be pushed down to the ultraviolet region, below 400 nm, making them ideal conductive elements for the fabrication of touch screens, solar cells, and smart windows. PMID:27483165

  10. Compact efficient diode-end-pumped intracavity frequency-tripled Nd:YAG 355 nm laser

    NASA Astrophysics Data System (ADS)

    Zuo, C. H.; Zhang, B. T.; Liu, Y. B.; Yang, J. F.; Huang, H. T.; Liu, S. D.; He, J. L.

    2010-08-01

    A compact efficient diode-end-pumped acousto-optically Q-switched intracavity-frequency-tripled Nd:YAG 355 nm ultraviolet laser was realized. Intracavity sub-resonators with anti-reflection and high-reflection coated mirrors were used to get higher efficiency of third harmonic generation. With two LBO crystals used in frequency doubling and tripling processes respectively, greater than 1.2 W 355 nm average output power was obtained under the absorbed pump power of 10 W and the repetition rate of 5 kHz. The corresponding pump-to-ultraviolet conversion efficiency was determined to be as high as 12%. At 5 kHz, the minimize pulse width was obtained to be 14.2 ns with the peak power of 16.9 kW and single pulse energy of 240 μJ. The instability of the 355 nm laser was measured to be less than 4.2% at an output power of 0.9 W within half an hour operation.

  11. Supercontinuum generation at 800 nm in all-normal dispersion photonic crystal fiber.

    PubMed

    Sukhoivanov, Igor A; Iakushev, Sergii O; Shulika, Oleksiy V; AndradeLucio, Jose Amparao; Díez, Antonio; Andrés, Miguel

    2014-12-01

    We have numerically investigated the supercontinuum generation and pulse compression in a specially designed all-normal dispersion photonic crystal fiber with a flat-top dispersion curve, pumped by typical pulses from state of the art Ti:Sapphire lasers at 800 nm. The optimal combination of pump pulse parameters for a given fiber was found, which provides a wide octave-spanning spectrum with superb spectral flatness (a drop in spectral intensity of ~1.7 dB). With regard to the pulse compression for these spectra, multiple-cycle pulses (~8 fs) can be obtained with the use of a simple quadratic compressor and nearly single-cycle pulses (3.3 fs) can be obtained with the application of full phase compensation. The impact of pump pulse wavelength-shifting relative to the top of the dispersion curve on the generated SC and pulse compression was also investigated. The optimal pump pulse wavelength range was found to be 750 nm < λp < 850 nm, where the distortions of pulse shape are quite small (< -3.3 dB). The influences of realistic fiber fabrication errors on the SC generation and pulse compression were investigated systematically. We propose that the spectral shape distortions generated by fiber fabrication errors can be significantly attenuated by properly manipulating the pump. PMID:25606954

  12. Detection of munitions grade g-series nerve agents using Raman excitation at 1064 nm

    NASA Astrophysics Data System (ADS)

    Roy, Eric; Wilcox, Phillip G.; Hoffland, Soren; Pardoe, Ian

    2015-05-01

    Raman spectroscopy is a powerful tool for obtaining molecular structure information of a sample. While Raman spectroscopy is a common laboratory based analytical tool, miniaturization of opto-electronic components has allowed handheld Raman analyzers to become commercially available. These handheld systems are utilized by Military and First Responder operators tasked with rapidly identifying potentially hazardous chemicals in the field. However, one limitation of many handheld Raman detection systems is strong interference caused by fluorescence of the sample or underlying surface which obscures the characteristic Raman signature of the target analyte. Munitions grade chemical warfare agents (CWAs) are produced and stored in large batches and typically have more impurities from the storage container, degradation, or unreacted precursors. In this work, Raman spectra of munitions grade CWAs were collected using a handheld Raman spectrometer with a 1064 nm excitation laser. While Raman scattering generated by a 1064 nm laser is inherently less efficient than excitation at shorter wavelengths, high quality spectra were easily obtained due to significantly reduced fluorescence of the munitions grade CWAs. The spectra of these less pure, but more operationally relevant, munitions grade CWAs were then compared to spectra of CASARM grade CWAs, as well as Raman spectra collected using the more common 785 nm excitation laser.

  13. Magnetic Behavior of Surface Nanostructured 50-nm Nickel Thin Films

    PubMed Central

    2010-01-01

    Thermally evaporated 50-nm nickel thin films coated on borosilicate glass substrates were nanostructured by excimer laser (0.5 J/cm2, single shot), DC electric field (up to 2 kV/cm) and trench-template assisted technique. Nanoparticle arrays (anisotropic growth features) have been observed to form in the direction of electric field for DC electric field treatment case and ruptured thin film (isotropic growth features) growth for excimer laser treatment case. For trench-template assisted technique; nanowires (70–150 nm diameters) have grown along the length of trench template. Coercive field and saturation magnetization are observed to be strongly dependent on nanostructuring techniques. PMID:21076670

  14. Cost-effective tunable 1310nm DWDM transmitter

    NASA Astrophysics Data System (ADS)

    Chorchos, Łukasz; Turkiewicz, Jarosław P.

    2015-09-01

    The growing demand for higher data rate transmissions in local and metropolitan area networks is main reason of developing effective and inexpensive transmission systems. In this paper, study about the possibility to realize 1310 nm tunable DWDM transmitter using commercially available low-cost DFB lasers is presented. Extensive DFB lasers characterization has been performed which led to establish relationships between laser current, operational temperature, emitted wavelength and power. An algorithm to find the laser settings for a desired wavelength grid has been proposed and tested. Generation of the 1310nm DWDM channels with frequency spacing between 120 and 240GHz has been demonstrated.

  15. Pseudomorphic Single-Quantum-Well Lasers Emit At 980 Nm

    NASA Technical Reports Server (NTRS)

    Larsson, Anders; Forouhar, Siamak; Cody, Jeffrey G.; Lang, Robert J.; Andrekson, Peter A.

    1992-01-01

    Narrow-stripe semiconductor lasers emitting at 980 nm include pseudomorphic In0.2Ga0.8As/GaAs/AlxGa1-xAs graded-index-of-refraction, separate-confinement-heterostructure single quantum well(GRINSCH SQW) with overlaid ridge waveguide. 980 nm chosen as one that yields most efficient pumping because there is no absorption in excited states at this wavelength. Suitable for pumping Er(Sup3+)-doped optical-fiber amplifiers in optical-fiber communication systems and optical phased-array ranging systems.

  16. Determination of transition probability for the 655-nm Tl line.

    NASA Astrophysics Data System (ADS)

    Karabourniotis, D.; Couris, S.; Damelincourt, J. J.

    Studies of high-pressure Hg-Tl I a.c. (50 Hz) arc plasmas have been used to verify the validity of Boltzmann statistics at the moment of maximum electron density (5 ms) by applying LTE criteria. For a known plasma temperature, the transition probability of the optically-thin 655-nm line of Tl was derived from emission measurements by using the self-reversed 535-nm line of Tl as reference [A655 = (3.74±0.37)×106s-1].

  17. Extension of 193 nm dry lithography to 45-nm half-pitch node: double exposure and double processing technique

    NASA Astrophysics Data System (ADS)

    Biswas, Abani M.; Li, Jianliang; Hiserote, Jay A.; Melvin, Lawrence S., III

    2006-10-01

    Immersion lithography and multiple exposure techniques are the most promising methods to extend lithography manufacturing to the 45nm node. Although immersion lithography has attracted much attention recently as a promising optical lithography extension, it will not solve all the problems at the 45-nm node. The 'dry' option, (i.e. double exposure/etch) which can be realized with standard processing practice, will extend 193-nm lithography to the end of the current industry roadmap. Double exposure/etch lithography is expensive in terms of cost, throughput time, and overlay registration accuracy. However, it is less challenging compared to other possible alternatives and has the ability to break through the κ I barrier (0.25). This process, in combination with attenuated PSM (att-PSM) mask, is a good imaging solution that can reach, and most likely go beyond, the 45-nm node. Mask making requirements in a double exposure scheme will be reduced significantly. This can be appreciated by the fact that the separation of tightly-pitched mask into two less demanding pitch patterns will reduce the stringent specifications for each mask. In this study, modeling of double exposure lithography (DEL) with att-PSM masks to target 45-nm node is described. In addition, mask separation and implementation issues of optical proximity corrections (OPC) to improve process window are studied. To understand the impact of OPC on the process window, Fourier analysis of the masks has been carried out as well.

  18. Precise Fabrication of Nanopores with Diameters of Sub-1 nm to 3 nm Using Multilevel Pulse-voltage Injection

    NASA Astrophysics Data System (ADS)

    Yanagi, Itaru; Akahori, Rena; Yokoi, Takahide; Takeda, Ken-Ichi

    2015-03-01

    To date, solid-state nanopores have been fabricated primarily through a focused-electronic beam via TEM. For mass production, however, a TEM beam is not suitable and an alternative fabrication method is required. Recently, a simple nanopore-fabrication method has been reported that is based on a dielectric breakdown phenomenon of a thin membrane. In this study, to stably fabricate nanopores with diameters of 1 to 2 nm (which is an essential size for distinguishing each nucleotide) via dielectric breakdown, a technique called multilevel pulse-voltage injection (MPVI) is proposed and demonstrated. MPVI uses pulse voltages for generating the nanopores, and the generation of the nanopores is verified by measuring the current through a membrane at low voltage. This method can generate nanopores with diameters of less than 1 nm in a 10-nm-thick Si3N4 membrane with a probability of 90%. The diameter of the generated nanopores can be widened to the desired diameters (up to 3 nm) with sub-nanometre precision. The mean effective thickness of the fabricated nanopores was 3.7 nm. These findings are derived from TEM images of the fabricated nanopores and analyses of ionic-current blockades during single-stranded DNA translocation.

  19. Size controlled synthesis of sub-100 nm monodisperse poly(methylmethacrylate) nanoparticles using surfactant-free emulsion polymerization.

    PubMed

    Camli, Sevket Tolga; Buyukserin, Fatih; Balci, Oguz; Budak, Gurer Guven

    2010-04-15

    Surfactant-free emulsion polymerization (SFEP) is a well-known technique for the production of polymeric nanoparticles that does not require post-synthetic cleaning steps. Obtaining hydrophobic particles at sub-100 nm scale, however, is quite challenging with this polymerization method. Here, we demonstrate a single step synthetic approach that yields poly(methylmethacrylate) (PMMA) nanoparticles with controlled sub-100 nm size and relatively high resultant solid content. Dynamic light scattering (DLS) was used for the particle characterization. Spherical and uniformly sized nanoparticles were confirmed by atomic force microscopy (AFM) and scanning electron microscopy (SEM). Acetone was used as a cosolvent in order to obtain monodisperse sub-100 nm diameter particles. Stable PMMA nanoparticle dispersions were obtained for all formulations where the persulfate initiator causes the negative charges on the particle surface. The effects of acetone, monomer and initiator concentration were studied to optimize average particle hydrodynamic diameter and polydispersity index of the final particles. Non-crosslinked monodisperse PMMA nanoparticles (polydispersity index less than 0.05) with diameters from 32 nm to 72 nm were synthesized by using this method. PMID:20138293

  20. Properties of AlF3 and LaF3 films at 193nm

    NASA Astrophysics Data System (ADS)

    Xue, Chunrong; Shao, Jianda

    2010-10-01

    In order to develop low loss, high-performance 193nm Fluoride HR mirrors and anti-reflection coatings, LaF3 and AlF3 materials, used for a single-layer coating, were deposited by a molybdenum boat evaporation process. Various microstructures that formed under different substrate temperatures and with deposition rates were investigated. The relation between these microstructures (including cross section morphology, surface roughness and crystalline structure), the optical properties (including refractive index and optical loss) and mechanical properties (stress) were investigated. Furthermore, AlF3 used as a low-index material and LaF3 used as a high-index material were designed and deposited for multilayer coatings. Transmittance, reflectance, stress, and the laser-induced damage threshold (LIDT) were studied. It is shown that AlF3 and LaF3 thin films, deposited on the substrate at a temperature of 300 °C, obtained good quality thin films with high transmittance and little optical loss at 193 nm. For multilayer coatings, the absorption mainly comes from LaF3. Based on these studies, The thickness of 193nm films was controled by a 1/3 baffle with pre-coating technology. the LaF3/AlF3 AR coantings and HR mirrors at 193nm were designed and deposited. Under the present experimental conditions, the reflectance of LaF3/AlF3 HR mirror is up to 96%, and its transmittance is 1.5%. the LaF3/AlF3 AR coanting's residual reflectance is less than 0.14%, and single-sided transmittance is 93.85%. To get a high-performance 193nm AR coating, super-polished substrate is the best choice.

  1. Radiative transfer modeling of the OI 135.6 nm emission in the nighttime ionosphere

    NASA Astrophysics Data System (ADS)

    Qin, Jianqi; Makela, Jonathan J.; Kamalabadi, Farzad; Meier, R. R.

    2015-11-01

    Remote sensing of the nighttime OI 135.6 nm emissions has been a widely used method for measuring the F region ionospheric plasma densities. In this work, we first develop a comprehensive radiative transfer model from first principles to investigate the effects of different physical processes on the production and transport of the 135.6 nm photons in the ionosphere and then propose a new approach for estimating electron densities from the nightglow. The forward modeling investigation indicates that under certain conditions mutual neutralization can contribute up to ˜38% of the total production of the nighttime 135.6 nm emissions. Moreover, depending on the ionospheric conditions, resonant scattering by atomic oxygen and pure absorption by oxygen molecules can reduce the limb brightness observed by satellite-borne instruments by up to ˜40% while enhancing the brightness viewing in the nadir direction by typically ˜25%. Further analysis shows that without properly addressing these effects in the inversion process, the peak electron density in the F region (NmF2) obtained using limb observations can be overestimated by up to ˜24%. For accurate estimation of the ionospheric electron density, we develop a new type of inverse model that accounts for the effects of mutual neutralization, resonant scattering, and pure absorption. This inversion method requires the knowledge of O and O2 densities in order to solve the radiative transfer equations. Application of the inverse model to the nighttime ionosphere in the noiseless cases demonstrates that the electron density can be accurately quantified with only ˜1% error in NmF2 and hmF2.

  2. Asymmetric MQW semiconductor optical amplifier with low-polarization sensitivity of over 90-nm bandwidth

    NASA Astrophysics Data System (ADS)

    Nkanta, Julie E.; Maldonado-Basilio, Ramón; Abdul-Majid, Sawsan; Zhang, Jessica; Hall, Trevor J.

    2013-12-01

    An exhausted capacity of current Passive Optical Networks has been anticipated as bandwidth-hungry applications such as HDTV and 3D video become available to end-users. To enhance their performance, the next generation optical access networks have been proposed, using optical carriers allocated within the E-band (1360-1460 nm). It is partly motivated by the low-water peak fiber being manufactured by Corning. At these wavelengths, choices for low cost optical amplifiers, with compact size, low energy consumption and feasibility for integration with other optoelectronic components are limited, making the semiconductor optical amplifiers (SOA) a realistic solution. An experimental characterization of a broadband and low polarization sensitive asymmetric multi quantum well (MQW) SOA operating in the E-band is reported. The SOA device is composed of nine 6 nm In1-xGaxAsyP1-y 0.2% tensile strained asymmetric MQW layers sandwiched between nine latticed matched 6 nm InGaAsP barrier layers. The active region is grown on an n-doped InP substrate and buried by p-doped InGaAsP layers. The SOA devices have 7-degrees tilt anti-reflected coated facets, with 2 μm ridge width, and a cavity length of 900 μm. For input powers of -10 dBm and -20 dBm, a maximum gain of 20 dB at 1360 nm with a polarization insensitivity under 3 dB for over 90 nm bandwidth is measured. Polarization sensitivity of less than 0.5 dB is observed for some wavelengths. Obtained results indicate a promising SOA with broadband amplification, polarization insensitivity and high gain. These SOAs were designed and characterized at the Photonics Technology Laboratory, University of Ottawa, Canada.

  3. Refractive index change during exposure for 193-nm chemically amplified resists

    NASA Astrophysics Data System (ADS)

    Oh, Hye-Keun; Sohn, Young-Soo; Sung, Moon-Gyu; Lee, Young-Mi; Lee, Eun-Mi; Byun, Sung Hwan; An, Ilsin; Lee, Kun-Sang; Park, In-Ho

    1999-06-01

    Some of the important areas to be improved for lithography simulation are getting correct exposure parameters and determining the change of refractive index. It is known that the real and imaginary refractive indices are changed during exposure. We obtained these refractive index changes during exposure for 193 nm chemically amplified resists. The variations of the transmittance as well as the resist thickness were measured during ArF excimer laser exposure. We found that the refractive index change is directly related to the concentration of the photo acid generator and de-protected resin. It is important to know the exact values of acid concentration from the exposure parameters since a small difference in acid concentration magnifies the variation in the amplified de-protection during post exposure bake. We developed and used a method to extract Dill ABC exposure parameters for 193 nm chemically amplified resist from the refractive index change upon exposure.

  4. Sub-30 nm thick plasmonic films and structures with ultralow loss.

    PubMed

    Teo, Ee Jin; Toyoda, Noriaki; Yang, Chengyuan; Wang, Bing; Zhang, Nan; Bettiol, Andrew A; Teng, Jing Hua

    2014-03-21

    We report an alternative method of producing sub-30 nm thick silver films and structures with ultralow loss using gas cluster ion beam irradiation (GCIB). We have direct evidence showing that scattering from grain boundaries and voids rather than surface roughness are the main mechanisms for the increase in loss with reducing thickness. Using GCIB irradiation, we demonstrate the ability to reduce these scattering effects simultaneously through nanoscale surface smoothing, increase in grain width and lower percolation threshold. Significant improvement in electrical and optical properties by up to 4 times is obtained, before deviation from bulk silver properties starts to occur at 12 nm. We show that this is an enabling technology that can be applied post fabrication to metallic films or lithographically patterned nanostructures for enhanced plasmonic performance, especially in the ultrathin regime. PMID:24504045

  5. High Conversion Efficiency and Power Stability of 532 nm Generation from an External Frequency Doubling Cavity

    NASA Astrophysics Data System (ADS)

    Zhao, Yang; Lin, Bai-Ke; Li, Ye; Zhang, Hong-Xi; Cao, Jian-Ping; Fang, Zhan-Jun; Li, Tian-Chu; Zang, Er-Jun

    2012-09-01

    We present a high-efficiency 532 nm green light conversion from an external cavity-enhanced second harmonic generation (SHG) with a periodically poled KTP crystal (PPKTP). The cavity is a bow-tie ring configuration with a unitized structure. When the impedance matching is optimized, the coupling efficiency of the fundamental is as high as 95%. Taking into account both the high power output of the second harmonic and the stability of the system, we obtain over 500 mW green passing through the output cavity mirror, corresponding to a net conversion efficiency higher than 75.2%. Under these operating conditions, the power stability is better than ±0.25% during 5 h. It is the highest conversion efficiency and power stability ever produced in the bow-tie ring cavity with PPKTP for 532 nm generation.

  6. Characterization of AlF3 thin films at 193 nm by thermal evaporation

    NASA Astrophysics Data System (ADS)

    Lee, Cheng-Chung; Liu, Ming-Chung; Kaneko, Masaaki; Nakahira, Kazuhide; Takano, Yuuichi

    2005-12-01

    Aluminum fluoride (AlF3) was deposited by a resistive heating boat. To obtain a low optical loss and high laser-induced damage threshold (LIDT) at 193 nm, the films were investigated under different substrate temperatures, deposition rates, and annealing after coating. The optical property (the transmittance, refractive index, extinction coefficient, and optical loss) at 193 nm, microstructure (the cross-sectional morphology, surface roughness, and crystalline structure), mechanical property (stress), and LIDT of AlF3 thin films have been studied. AlF3 thin films deposited at a high substrate temperature and low deposition rate showed a lower optical loss. The highest LIDT occurred at the substrate temperature of 150 °C. The LIDT of the films prepared at a deposition rate of 2 Å/s was higher than that at other deposition rates. The annealing process did not influence the optical properties too much, but it did increase the LIDT and stress.

  7. Microstructure of magnesium fluoride films deposited by boat evaporation at 193 nm.

    PubMed

    Liu, Ming-Chung; Lee, Cheng-Chung; Kaneko, Masaaki; Nakahira, Kazuhide; Takano, Yuuichi

    2006-10-01

    Single layer magnesium fluoride (MgF2) was deposited on fused-silica substrates by a molybdenum boat evaporation process at 193 nm. The formation of various microstructures in relation to the different substrate temperatures and deposition rates were investigated. The relation between these microstructures (including cross-sectional morphology, surface roughness, and crystalline structures), the optical properties (including refractive index and optical loss) and stress, were all investigated. It was found that the laser-induced damage threshold (LIDT) would be affected by the microstructure, optical loss, and stress of the thin film. To obtain a larger LIDT value and better optical characteristics, MgF2 films should be deposited at a high substrate temperature (300 degrees C) and at a low deposition rate (0.05 nm s(-1)). PMID:16983421

  8. Microstructure of magnesium fluoride films deposited by boat evaporation at 193 nm

    NASA Astrophysics Data System (ADS)

    Liu, Ming-Chung; Lee, Cheng-Chung; Kaneko, Masaaki; Nakahira, Kazuhide; Takano, Yuuichi

    2006-10-01

    Single layer magnesium fluoride (MgF2) was deposited on fused-silica substrates by a molybdenum boat evaporation process at 193 nm. The formation of various microstructures in relation to the different substrate temperatures and deposition rates were investigated. The relation between these microstructures (including cross-sectional morphology, surface roughness, and crystalline structures), the optical properties (including refractive index and optical loss) and stress, were all investigated. It was found that the laser-induced damage threshold (LIDT) would be affected by the microstructure, optical loss, and stress of the thin film. To obtain a larger LIDT value and better optical characteristics, MgF2 films should be deposited at a high substrate temperature (300 °C) and at a low deposition rate (0.05 nm s-1).

  9. Characterization of AlF3 thin films at 193 nm by thermal evaporation.

    PubMed

    Lee, Cheng-Chung; Liu, Ming-Chung; Kaneko, Masaaki; Nakahira, Kazuhide; Takano, Yuuichi

    2005-12-01

    Aluminum fluoride (AlF3) was deposited by a resistive heating boat. To obtain a low optical loss and high laser-induced damage threshold (LIDT) at 193 nm, the films were investigated under different substrate temperatures, deposition rates, and annealing after coating. The optical property (the transmittance, refractive index, extinction coefficient, and optical loss) at 193 nm, microstructure (the cross-sectional morphology, surface roughness, and crystalline structure), mechanical property (stress), and LIDT of AlF3 thin films have been studied. AlF3 thin films deposited at a high substrate temperature and low deposition rate showed a lower optical loss. The highest LIDT occurred at the substrate temperature of 150 degrees C. The LIDT of the films prepared at a deposition rate of 2 A/s was higher than that at other deposition rates. The annealing process did not influence the optical properties too much, but it did increase the LIDT and stress. PMID:16353803

  10. Highly efficient continuous-wave Nd:YAG ceramic lasers at 946 nm

    NASA Astrophysics Data System (ADS)

    Zhu, H. Y.; Xu, C. W.; Zhang, J.; Tang, D. Y.; Luo, D. W.; Duan, Y. M.

    2013-07-01

    Highly efficient CW operation of diode-end-pumped Nd:YAG ceramic lasers at 946 nm is experimentally demonstrated. When a 5 mm long in-house fabricated Nd:YAG ceramic was used as the gain medium, a maximum output power of 10.5 W was obtained under an incident pump power of 35 W, corresponding to an optical conversion efficiency of 30%, while, when a 3 mm long ceramic sample was used, a maximum output power of 8.7 W was generated with a slope efficiency of 65% with respect to the absorbed pump power. Both the optical conversion efficiency and slope efficiency are the highest results reported so far for the diode-pumped 946 nm lasers.

  11. Stark width measurements of Fe II lines with wavelengths in the range 230-260 nm

    NASA Astrophysics Data System (ADS)

    Aguilera, J. A.; Manrique, J.; Aragón, C.

    2011-12-01

    The experimental Stark widths of 26 Fe II lines with wavelengths in the range 230-260 nm have been determined by laser-induced breakdown spectroscopy. These measurements complete the data reported previously for the wavelength range 260-300 nm. The laser-induced plasmas have been generated from Fe-Cu and Fe-Ni samples. The curve-of-growth methodology is used to determine the iron concentration required to avoid self-absorption. The electron density at the different instants of the plasma lifetime, determined from the Stark broadening of the Hα line, is in the range (1.6-7.4) × 1017 cm-3. The plasma temperature is in the range 12 900-15 200 K. The Stark widths obtained are compared with previous experimental and theoretical data.

  12. Sub-10 nm nano-gap device for single-cluster transport measurements

    SciTech Connect

    Rousseau, J. Morel, R.; Vila, L.; Brenac, A.; Marty, A.; Notin, L.; Beigné, C.

    2014-02-17

    We present a versatile procedure for the fabrication of single electron transistor (SET) devices with nanometer-sized clusters and embedded back gate electrode. The process uses sputtering gas-aggregation for the growth of clusters and e-beam lithography with double angle shadow-edge deposition to obtain electrodes separated by nano-gaps with width below 10 nm. The nano-gap width is easily controlled only by geometrical factors such as deposited thin film thickness and evaporation angles. The usefulness of this technique is demonstrated by measuring the SET behavior of a device with a 4 nm cobalt cluster embedded in alumina, where the Coulomb blockade and incremental cluster charging can be readily identified without resorting to the differential conductivity.

  13. High-speed 405-nm superluminescent diode (SLD) with 807-MHz modulation bandwidth.

    PubMed

    Shen, Chao; Lee, Changmin; Ng, Tien Khee; Nakamura, Shuji; Speck, James S; DenBaars, Steven P; Alyamani, Ahmed Y; El-Desouki, Munir M; Ooi, Boon S

    2016-09-01

    III-nitride LEDs are fundamental components for visible-light communication (VLC). However, the modulation bandwidth is inherently limited by the relatively long carrier lifetime. In this letter, we present the 405 nm emitting superluminescent diode (SLD) with tilted facet design on semipolar GaN substrate, showing a broad emission of ~9 nm at 20 mW optical power. Owing to the fast recombination (τe<0.35 ns) through the amplified spontaneous emission, the SLD exhibits a significantly large 3-dB bandwidth of 807 MHz. A data rate of 1.3 Gbps with a bit-error rate of 2.9 × 10-3 was obtained using on-off keying modulation scheme, suggesting the SLD being a high-speed transmitter for VLC applications. PMID:27607634

  14. Linewidth characteristics of Raman-shifted dye laser output at 720 and 940 nm

    NASA Technical Reports Server (NTRS)

    Grossmann, B. E.; Singh, U. N.; Cotnoir, L. J.; Wilkerson, T. D.; Higdon, N. S.; Browell, E. V.

    1986-01-01

    Raman conversion efficiency and line broadening are reported for Stokes operation at 720 and 940 nm, with hydrogen and deuterium as the Raman source, and using an Nd:YAG pumped Quanta-Ray PDL-2 dye laser. The dye laser linewidth is 0.2/cm (FWHM) with the grating alone as an intracavity element, and the conversion efficiency at 400 psi was found to be 40 and 20 percent for outputs of 720 and 940 nm, respectively. Pressure broadening coefficients of (9.2 + or - 0.9) x 10 to the -5th per cm/psi for hydrogen, and 7.7 x 10 to the -5th per cm/psi for deuterium, were obtained in good agreement with previous results. The linewidth at the first Stokes wavelength was shown to be determined by pressure broadening in the Raman medium.

  15. High-efficiency blue light generation at 426 nm in low pump regime

    NASA Astrophysics Data System (ADS)

    Tian, Jianfeng; Yang, Chen; Xue, Jia; Zhang, Yuchi; Li, Gang; Zhang, Tiancai

    2016-05-01

    We report high-efficiency Ti:sapphire-laser-based frequency doubling at the cesium D2 line 852 nm using a 20 mm-long periodically-poled potassium titanyl phosphate crystal in a bow-tie four-mirror ring enhancement cavity. The relatively complete cavity design procedure is presented. Focusing that is over twice as loose as optimal focusing is used, and both the fundamental frequency wave and second harmonic beam absorption-induced thermal lensing effects are weakened. Blue light of 210 mW at 426 nm, where absorption is severe, was obtained with 310 mW mode-matched fundamental light, corresponding to conversion efficiency of up to 67%. The blue light beam power showed 1.5% RMS fluctuation over 40 min.

  16. High energy 523 nm ND:YLF pulsed slab laser with novel pump beam waveguide design

    NASA Astrophysics Data System (ADS)

    Yang, Qi; Zhu, Xiaolei; Ma, Jian; Lu, Tingting; Ma, Xiuhua; Chen, Weibiao

    2015-11-01

    A laser diode pumped Nd:YLF master oscillator power amplifier (MOPA) green laser system with high pulse energy and high stable output is demonstrated. At a repetition rate of 50 Hz, 840 mJ pulse energy, 9.1 ns pulse width of 1047 nm infrared laser emitting is obtained from the MOPA system. The corresponding peak power is 93 MW. Extra-cavity frequency doubling with a LiB3O5 crystal, pulse energy of 520 mJ at 523 nm wavelength is achieved. The frequency conversion efficiency reaches up to 62%. The output pulse energy instability of the laser system is less than 0.6% for one hour.

  17. Compact non-cascaded all-fiber Raman laser operating at 1174 nm

    NASA Astrophysics Data System (ADS)

    Wang, Jiachen; Lee, Sang Bae; Lee, Kwanil

    2016-07-01

    We investigate a non-cascaded, all-fiber, single-mode Raman fiber laser (RFL) operating at 1174 nm with an optical slope efficiency of 68%. An ~1-km commercial single-mode fiber is used as the Raman gain medium. The RFL cavity is formed between a high reflectivity fiber Bragg grating (FBG) and a perpendicularly-cleaved fiber facet. The laser is pumped by using a homemade ytterbium-doped fiber laser (YDFL) and can be frequency doubled to generate yellow light. Under the optimum condition, A 6.9-W 1174-nm laser is obtained at maximum available power (24 W) of a laser diode pump. The optical conversion efficiency and the net slope efficiency of the RFL were respectively, 29% and 38%, with respect to launched diode laser power. We also demonstrate yellow-light generation by frequency doubling of the RFL.

  18. Near-field fluorescence imaging with 32 nm resolution based on microfabricated cantilevered probes

    NASA Astrophysics Data System (ADS)

    Eckert, Rolf; Freyland, J. Moritz; Gersen, Henkjan; Heinzelmann, Harry; Schürmann, Gregor; Noell, Wilfried; Staufer, Urs; de Rooij, Nico F.

    2000-12-01

    High-resolution near-field optical imaging with microfabricated probes is demonstrated. The probes are made from solid quartz tips fabricated at the end of silicon cantilevers and covered with a 60-nm-thick aluminum film. Transmission electron micrographs indicate a continuous aluminum layer at the tip apex. A specially designed instrument combines the advantages of near-field optical and beam-deflection force microscopy. Near-field optical data of latex bead projection patterns in transmission and of single fluorophores have been obtained in constant-height imaging mode. An artifact-free optical resolution of 31.7±3.6 nm has been deduced from full width at half maximum values of single molecule images.

  19. Temperature- and pressure-dependent absorption coefficients for CO2 and O2 at 193 nm

    NASA Astrophysics Data System (ADS)

    Hartinger, K. T.; Nord, S.; Monkhouse, P. B.

    Absorption of laser radiation at 193 nm by CO2 and O2 was studied at a series of different temperatures up to 1273 K and pressures up to 1 bar. The spectrum for CO2 was found to be broadband, so that absorption could be fitted to a Beer-Lambert law. On the other hand, the corresponding O2 spectrum is strongly structured and parameterisation requires a more complex relation, depending on both temperature and the product (pressure × absorption path length). In this context, the influence of spectral structure on the resulting spectrally integrated absorption coefficients is discussed. Using the fitting parameters obtained, effective transmissions at 193 nm can be calculated for a wide range of experimental conditions. As an illustration of the practical application of these data, the calculation of effective transmission for a typical industrial flue gas is described.

  20. Characterization of single 1.8-nm Au nanoparticle attachments on AFM tips for single sub-4-nm object pickup

    PubMed Central

    2013-01-01

    This paper presents a novel method for the attachment of a 1.8-nm Au nanoparticle (Au-NP) to the tip of an atomic force microscopy (AFM) probe through the application of a current-limited bias voltage. The resulting probe is capable of picking up individual objects at the sub-4-nm scale. We also discuss the mechanisms involved in the attachment of the Au-NP to the very apex of an AFM probe tip. The Au-NP-modified AFM tips were used to pick up individual 4-nm quantum dots (QDs) using a chemically functionalized method. Single QD blinking was reduced considerably on the Au-NP-modified AFM tip. The resulting AFM tips present an excellent platform for the manipulation of single protein molecules in the study of single protein-protein interactions. PMID:24237663

  1. Multicolor Bioluminescence Obtained Using Firefly Luciferin.

    PubMed

    Kiyama, Masahiro; Saito, Ryohei; Iwano, Satoshi; Obata, Rika; Niwa, Haruki; Maki, Shojiro A

    2016-01-01

    Firefly bioluminescence is widely used in life science research as a useful analysis tool. For example, the adenosine-5`-triphosphate (ATP)-dependent enzymatic firefly bioluminescence reaction has long been utilized as a microbial monitoring tool. Rapid and sensitive firefly luciferin-luciferase combinations are used not only to measure cell viability but also for reporter-gene assays. Recently, bioluminescence was utilized as a noninvasive, real-time imaging tool for living subjects to monitor cells and biological events. However, the number of commercialized luciferase genes is limited and tissue-permeable near-infrared (NIR) region emitting light is required for in vivo imaging. In this review, recent studies describing synthetic luciferin analogues predicted to have red-shifted bioluminescence are summarized. Luciferase substrates emitting red, green, and blue light that were designed and developed in our laboratory are presented. The longest emission wavelength of the synthesized luciferin analogues was recorded at 675 nm, which is within the NIR region. This compound is now commercially available as "Aka Lumine®". PMID:27072707

  2. Obtaining Stokes Parameters from the SUMI Experiment

    NASA Technical Reports Server (NTRS)

    Fayock, Brian; Winebarger, Amy; Cirtain, Jonathan; Kobayashi, Ken; West, Ed

    2014-01-01

    A sounding rocket experiment designed at the Marshall Space Flight Center, named the Solar Ultraviolet Magnetograph Investigation, had its second launch in July of 2012 to test the feasibility of measuring polarization signals of the ionized magnesium resonance doublet near 280 nm, originating from the transition region. The rocket housed a telescope at the front end and an imaging system at the rear end. Placed at the focal point of the self-filtering telescope, a wave plate rotated through 12 predefined angular orientations to restrict the measurements to specific combinations of circular and linear polarization. Coupled with a double Wollaston analyzer, the linearly polarized ordinary and extraordinary beams were measured for the 12 combinations, each containing different fractions of the Stokes parameters (I, Q, U, V). A thorough analysis of the data has allowed us to come to several conclusions regarding the design of the experiment. 1) We are confident that polarization can be measured. A sunspot region was determined to exhibit similar results over multiple pixels. 2) Measurements are limited by resolution, i.e. regions smaller than the angular resolution per pixel cannot be resolved with any certainty. 3) Temporal evolution of magnetic features must be considered in future experimental designs. Measurements need to be taken in repeated cycles as opposed to a single cycle over the duration of the experiment. In our presentation, we will provide a summary of the observations along with the methods of our analysis, including the limitations that we've encountered.

  3. Data preparation solution for e-beam multiple pass exposure: reaching sub-22nm nodes with a tool dedicated to 45 nm

    NASA Astrophysics Data System (ADS)

    Martin, Luc; Manakli, Serdar; Bayle, Sébastien; Choi, Kang-Hoon; Gutsch, Manuela; Pradelles, Jonathan; Bustos, Jessy

    2011-04-01

    Electron Beam Direct Write (EBDW) lithography is used in the IC manufacturing industry to sustain optical lithography for prototyping applications and low volume manufacturing. It is also used in R&D to develop advanced technologies, ahead of mass production. As microelectronics is now moving towards the 32nm node and beyond, the specifications in terms of dimension control and roughness becomes tighter. In addition, the shrink of the size and pitch of features significantly reduces the process window of lithographic tools. In EBDW, the standard proximity effects corrections only based on dose modulation show difficulties to provide the required Energy Latitude for patterning structures designed below 45nm. A new approach is thus needed to improve the process window of EBDW lithography and push its resolution capabilities. In previous papers, a new writing strategy based on multiple pass exposure has been introduced and optimized to pattern critical dense lines. This new technique consists in adding small electron Resolution Improvement Features (eRIFs) on top of the nominal structures. Then this new design is exposed in two successive passes with optimized doses. Previous studies were led to evaluate this new writing technique and establish rules to optimize the design of the eRIF. Significant improvements have already been demonstrated on SRAM and Logic structures down to the 16nm node. These results were obtained with a tool dedicated to the 45nm node. The next step of this work is thus to automatically implement the eRIF to correct large-scale layouts. In this paper, a new data preparation flow is set up for EBDW lithography. It uses the eRIF solution as a full advanced correction method for critical structures. The specific correction rules established in our previous studies are implemented to improve the CD control and the patterning of corners and line ends. Moreover, the dose and shape of the eRIFs are automatically tuned to best fit the nominal design

  4. 40 CFR 761.208 - Obtaining manifests.

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... print the manifest under 40 CFR 262.21 (c) and (e). A registered source may be a: (i) State agency; (ii) Commercial printer; (iii) PCB waste generator, transporter or, designated facility; or (iv) PCB waste broker... PROHIBITIONS PCB Waste Disposal Records and Reports § 761.208 Obtaining manifests. (a)(1) A generator may...

  5. 40 CFR 761.208 - Obtaining manifests.

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... print the manifest under 40 CFR 262.21 (c) and (e). A registered source may be a: (i) State agency; (ii) Commercial printer; (iii) PCB waste generator, transporter or, designated facility; or (iv) PCB waste broker... PROHIBITIONS PCB Waste Disposal Records and Reports § 761.208 Obtaining manifests. (a)(1) A generator may...

  6. 42 CFR 442.101 - Obtaining certification.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... 42 Public Health 4 2012-10-01 2012-10-01 false Obtaining certification. 442.101 Section 442.101 Public Health CENTERS FOR MEDICARE & MEDICAID SERVICES, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL ASSISTANCE PROGRAMS STANDARDS FOR PAYMENT TO NURSING FACILITIES AND INTERMEDIATE...

  7. 42 CFR 442.101 - Obtaining certification.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... 42 Public Health 4 2013-10-01 2013-10-01 false Obtaining certification. 442.101 Section 442.101 Public Health CENTERS FOR MEDICARE & MEDICAID SERVICES, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL ASSISTANCE PROGRAMS STANDARDS FOR PAYMENT TO NURSING FACILITIES AND INTERMEDIATE...

  8. 42 CFR 442.101 - Obtaining certification.

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... 42 Public Health 4 2014-10-01 2014-10-01 false Obtaining certification. 442.101 Section 442.101 Public Health CENTERS FOR MEDICARE & MEDICAID SERVICES, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL ASSISTANCE PROGRAMS STANDARDS FOR PAYMENT TO NURSING FACILITIES AND INTERMEDIATE...

  9. Obtaining Your License: Careers in Real Estate.

    ERIC Educational Resources Information Center

    Lyon, Robert

    Two steps are required to obtain a real estate salesperson's license in Texas: (1) selecting a broker to serve as an advisor, and (2) meeting personal requirements (at least 18 years old, a Texas resident, completion of a minimum of 12 semester hours of real estate and related courses, application, acceptable score on state exam, and payment of…

  10. 15 CFR 285.15 - Obtaining documents.

    Code of Federal Regulations, 2010 CFR

    2010-01-01

    ... 15 Commerce and Foreign Trade 1 2010-01-01 2010-01-01 false Obtaining documents. 285.15 Section 285.15 Commerce and Foreign Trade Regulations Relating to Commerce and Foreign Trade NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY, DEPARTMENT OF COMMERCE ACCREDITATION AND ASSESSMENT PROGRAMS...

  11. Obtaining Funding and Support for Undergraduate Research

    ERIC Educational Resources Information Center

    Dorff, Michael; Narayan, Darren A.

    2013-01-01

    Over the past decade there has been a dramatic increase in undergraduate research activities at colleges and universities nationwide. However, this comes at a time when budgets are being tightened and some institutions do not have the resources to pursue new initiatives. In this article we present some ideas for obtaining funding and support for…

  12. 15 CFR 285.15 - Obtaining documents.

    Code of Federal Regulations, 2012 CFR

    2012-01-01

    ...; phone: 301-975-4016; fax: 301-926-2884; e-mail: nvlap@nist.gov. (b) Copies of all ISO/IEC documents are..., Gaithersburg, MD. For access to the NIST campus, please contact NVLAP by phone at 301-975-4016 or by e-mail at NVLAP@nist.gov to obtain instructions for visitor registration....

  13. Method of Obtaining Uniform Coatings on Graphite

    DOEpatents

    Campbell, I. E.

    1961-04-01

    A method is given for obtaining uniform carbide coatings on graphite bodies. According to the invention a metallic halide in vapor form is passed over the graphite body under such conditions of temperature and pressure that the halide reacts with the graphite to form a coating of the metal carbide on the surface of the graphite.

  14. METHOD OF OBTAINING UNIFORM COATINGS ON GRAPHITE

    DOEpatents

    Campbell, I.E.

    1961-04-01

    A method is given for obtaining uniform carbide coatings on graphite bodies. According to the invention a metallic halide in vapor form is passed over the graphite body under such conditions of temperature and pressure that the halide reacts with the graphite to form a coating of the metal carbide on the surface of the graphite.

  15. Narrow linewidth broadband tunable semiconductor laser at 840 nm with dual acousto-optic tunable configuration for OCT applications

    NASA Astrophysics Data System (ADS)

    Chamorovskiy, Alexander; Shramenko, Mikhail V.; Lobintsov, Andrei A.; Yakubovich, Sergei D.

    2016-03-01

    We demonstrate a tunable narrow linewidth semiconductor laser for the 840 nm spectral range. The laser has a linear cavity comprised of polarization maintaining (PM) fiber. A broadband semiconductor optical amplifier (SOA) in in-line fiber-coupled configuration acts as a gain element. It is based on InGaAs quantum-well (QW) active layer. SOA allows for tuning bandwidth exceeding 25 nm around 840 nm. Small-signal fiber-to-fiber gain of SOA is around 30 dB. A pair of acousto-optic tunable filters (AOTF) with a quasi-collinear interaction of optical and acoustic waves are utilized as spectrally selective elements. AOTF technology benefits in continuous tuning, broadband operation, excellent reproducibility and stability of the signal, as well as a high accuracy of wavelength selectivity due to the absence of mechanically moving components. A single AOTF configuration has typical linewidth in 0.05-0.15 nm range due to a frequency shift obtained during each roundtrip. A sequential AOTF arrangement enables instantaneous linewidth generation of <0.01 nm by compensating for this shift. Linewidth as narrow as 0.0036 nm is observed at 846 nm wavelength using a scanning Fabry-Perot interferometer with 50 MHz spectral resolution. Output power is in the range of 1 mW. While the majority of commercial tunable sources operate in 1060-1550 nm spectral ranges, the 840 nm spectral range is beneficial for optical coherence tomography (OCT). The developed narrow linewidth laser can be relevant for OCT with extended imaging depth, as well as spectroscopy, non-destructive testing and other applications.

  16. Imaging challenges in 20nm and 14nm logic nodes: hot spots performance in Metal1 layer

    NASA Astrophysics Data System (ADS)

    Timoshkov, V.; Rio, D.; Liu, H.; Gillijns, W.; Wang, J.; Wong, P.; Van Den Heuvel, D.; Wiaux, V.; Nikolsky, P.; Finders, J.

    2013-10-01

    The 20nm Metal1 layer, based on ARM standard cells, has a 2D design with minimum pitch of 64nm. This 2D design requires a Litho-Etch-Litho-Etch (LELE) double patterning. The whole design is divided in 2 splits: Me1A and Me1B. But solution of splitting conflicts needs stitching at some locations, what requires good Critical Dimension (CD) and overlay control to provide reliable contact between 2 stitched line ends. ASML Immersion NXT tools are aimed at 20 and 14nm logic production nodes. Focus control requirements become tighter, as existing 20nm production logic layouts, based on ARM, have about 50-60nm focus latitude and tight CD Uniformity (CDU) specifications, especially for line ends. IMEC inspected 20nm production Metal1 ARM standard cells with a Negative Tone Development (NTD) process using the Process Window Qualification-like technique experimentally and by Brion Tachyon LMC by simulations. Stronger defects were found thru process variations. A calibrated Tachyon model proved a good overall predictability capability for this process. Selected defects are likely to be transferred to hard mask during etch. Further, CDU inspection was performed for these critical features. Hot spots showed worse CD uniformity than specifications. Intra-field CDU contribution is significant in overall CDU budget, where reticle has major impact due to high MEEF of hot spots. Tip-to-Tip and tip-to-line hot spots have high MEEF and its variation over the field. Best focus variation range was determined by best focus offsets between hot spots and its variation within the field.

  17. Arsenic Removal from Drinking Water by Absorptive Media-U.S. EPA Demonstration Project at Desert Sands MDWCA, NM Final Performance Evaluation Report

    EPA Science Inventory

    This report documents the activities performed and the results obtained for the arsenic removal treatment technology demonstration project at the Desert Sands Mutual Domestic Water Consumers Association (MDWCA) facility in Anthony, NM. The objectives of the project were to evalu...

  18. Can Homojunction Tunnel FETs Scale Below 10 nm?

    NASA Astrophysics Data System (ADS)

    Ilatikhameneh, Hesameddin; Klimeck, Gerhard; Rahman, Rajib

    2016-01-01

    The main promise of tunnel FETs (TFETs) is to enable supply voltage ($V_{DD}$) scaling in conjunction with dimension scaling of transistors to reduce power consumption. However, reducing $V_{DD}$ and channel length ($L_{ch}$) typically deteriorates the ON- and OFF-state performance of TFETs, respectively. Accordingly, there is not yet any report of a high perfor]mance TFET with both low V$_{DD}$ ($\\sim$0.2V) and small $L_{ch}$ ($\\sim$6nm). In this work, it is shown that scaling TFETs in general requires scaling down the bandgap $E_g$ and scaling up the effective mass $m^*$ for high performance. Quantitatively, a channel material with an optimized bandgap ($E_g\\sim1.2qV_{DD} [eV]$) and an engineered effective mass ($m*^{-1}\\sim40 V_{DD}^{2.5} [m_0^{-1}]$) makes both $V_{DD}$ and $L_{ch}$ scaling feasible with the scaling rule of $L_{ch}/V_{DD}=30~nm/V$ for $L_{ch}$ from 15nm to 6nm and corresponding $V_{DD}$ from 0.5V to 0.2V.

  19. 78 FR 66982 - Santa Clara Pueblo Disaster #NM-00039

    Federal Register 2010, 2011, 2012, 2013, 2014

    2013-11-07

    ... ADMINISTRATION Santa Clara Pueblo Disaster NM-00039 AGENCY: U.S. Small Business Administration. ACTION: Notice... for the Santa Clara Pueblo (FEMA- 4151-DR), dated 10/29/2013. Incident: Severe Storms and Flooding... disaster: Primary Areas: Santa Clara Pueblo. The Interest Rates are: Percent For Physical Damage:...

  20. Ca II 854.2 nm BISECTORS AND CIRCUMFACULAR REGIONS

    SciTech Connect

    Pietarila, A.; Harvey, J. W.

    2013-02-20

    Active regions appear bright in Ca II 854.2 nm line core intensity while the surrounding areas, referred to as circumfacular regions, are darker than the active region or the quiet Sun. We use Synoptic Optical Long-term Investigations of the Sun Vector Spectromagnetograph Ca II 854.2 nm data (photospheric and chromospheric full disk magnetograms as well as high spectral resolution Stokes I and V profiles) to study the connection between magnetic canopies, circumfacular regions, and Ca II 854.2 nm bisector amplitudes (spans). The line bisector amplitude is reduced in circumfacular regions, where the 3 minute period power in chromospheric H{alpha} intensity oscillations is also reduced relative to the surrounding quiet Sun. The latter is consistent with magnetic canopies in circumfacular regions suppressing upward propagating steepening acoustic waves. Our results provide further strong evidence for shock waves as the cause of the inverse C-shaped bisector and explain the observed solar cycle variation of the shape and amplitude of Sun-as-a-star Ca II 854.2 nm bisectors.

  1. VUV spectrophotometry for photomasks characterization at 193 nm

    NASA Astrophysics Data System (ADS)

    Yang, Minghong; Leiterer, Jork; Gatto, Alexandre; Kaiser, Norbert; Höllein, Ingo; Teuber, Silvio; Bubke, Karsten

    2005-10-01

    This paper intends to develop a measurement system to characterize photomasks for 193 nm lithography applications. Based on the VUV spectrophotometer at the Fraunhofer IOF institute, some modifications have been addressed to fulfil these special measurements. Characterizations on photomasks have been successfully carried out, which show good correlations to simulations.

  2. Scatterometry for EUV lithography at the 22-nm node

    NASA Astrophysics Data System (ADS)

    Bunday, Benjamin; Vartanian, Victor; Ren, Liping; Huang, George; Montgomery, Cecilia; Montgomery, Warren; Elia, Alex; Liu, Xiaoping

    2011-03-01

    Moore's Law continues to drive improvements to lithographic resolution to increase integrated circuit transistor density, improve performance, and reduce cost. For the 22 nm node and beyond, extreme ultraviolet lithography (EUVL) is a promising technology with λ=13.5 nm, a larger k1 value and lower cost of ownership than other available technologies. For small feature sizes, process control will be increasingly challenging, as small features will create measurement uncertainties, yet with tighter specifications. Optical scatterometry is a primary candidate metrology for EUV lithography process control. Using simulation and experimental data, this work will explore scatterometry's application to a typical lithography process being used for EUV development, which should be representative of lithography processes that will be utilized for EUV High Volume manufacturing (HVM). EUV lithography will be performed using much thinner photoresist thicknesses than were used at the 248nm or 193nm lithography generations, and will probably include underlayers for adhesion improvement; these new processes conditions were investigated in this metrological study.

  3. Blue light (470 nm) effectively inhibits bacterial and fungal growth

    Technology Transfer Automated Retrieval System (TEKTRAN)

    The activity of blue light (470nm) alone on (1) bacterial viability, and (2) with a food grade photosensitizer on filamentous fungal viability, was studied. Suspensions of the bacteria Leuconostoc mesenteroides (LM), Bacillus atrophaeus (BA), and Pseudomonas aeruginosa (PA) were prepared and aliquo...

  4. High average power, narrow band 248 nm alexandrite laser system

    SciTech Connect

    Kuper, J.W.; Chin, T.C.; Papanestor, P.A.

    1994-12-31

    A compact line-narrowed 248 nm solid state laser source operating at 15 mJ {at} 100 Hz PRF was demonstrated. Constraints due to thermal loading of components were addressed. Tradeoffs between pulse energy and repetition rate were investigated. A method for overcoming thermal dephasing in the THG material was achieved by scanning a slab shaped crystal.

  5. Encapsulated inorganic resist technology applied to 157-nm lithography

    NASA Astrophysics Data System (ADS)

    Fedynyshyn, Theodore H.; Sinta, Roger F.; Sworin, Michael; Goodman, Russell B.; Doran, Scott P.; Sondi, I.; Matijevic, Egon

    2001-08-01

    In order to increase plasma etch selectivity in traditional single layer organic resists SiO2 nanoparticles have been added to typical 248nm resist formulations. Formulation modifications are necessary due to the dissolution acceleration effect of the particles. Surface functionalization of the nanoparticle surfaces with organic groups lessens this effect and allows the inclusion of acid labile groups. This allows for a wider formulation window and limits unexposed film thickness losses (UFTL). Both t- butyl ester groups and poly(t-butyl acrylate) have been used to achieve this effect. Encapsulated inorganic resist technology (EIRT) can be used as a single layer hard mask compatible with existing resist processing steps and replace complex and costly multilevel resist approaches. Lithogrpahic evaluations have been performed with electron beam, and with 248nm and 157nm projection systems. Greater transparency at 157nm is achieved by the addition of these materials, thus enabling the use of thicker films. High resolution imaging is demonstrated at these wavelengths.

  6. Photoabsorption cross section of OD at 115-180 nm

    NASA Technical Reports Server (NTRS)

    Nee, J. B.; Lee, L. C.

    1984-01-01

    The photoabsorption cross sections of OD in the 115-180 nm region were measured. The OD radicals were produced from a pulsed discharge in a mixture containing a trace of D2O in a few Torr of argon. Results are compared with the photoabsorption of OH previously measured.

  7. 78 FR 67210 - Santa Clara Pueblo Disaster #NM-00038

    Federal Register 2010, 2011, 2012, 2013, 2014

    2013-11-08

    ... From the Federal Register Online via the Government Publishing Office SMALL BUSINESS ADMINISTRATION Santa Clara Pueblo Disaster NM-00038 AGENCY: U.S. Small Business Administration. ACTION: Notice...: Submit completed loan applications to: U.S. Small Business Administration, Processing and...

  8. 77 FR 62481 - Radio Broadcasting Services; Crownpoint, NM

    Federal Register 2010, 2011, 2012, 2013, 2014

    2012-10-15

    ... COMMISSION 47 CFR Part 73 Radio Broadcasting Services; Crownpoint, NM AGENCY: Federal Communications....415 and 1.420. List of Subjects in 47 CFR Part 73 Radio, Radio broadcasting. Federal Communications... preamble, the Federal Communications Commission proposes to amend 47 CFR Part 73 as follows: PART...

  9. EUV optical design for 100 nm CD imaging system

    SciTech Connect

    Sweeney, D.W.; Hudyma, R.; Chapman, H.B.; Shafer, D.

    1998-04-09

    The imaging specifications for extreme ultraviolet lithography (EUVL) projection optics parallel those of other optical lithographies. Specifications are scaled to reflect the 100 nm critical dimension for the first generation EUVL systems. The design being fabricated for the Engineering Test Stand, an EUVL alpha tool, consists of a condenser with six channels to provide an effective partial coherence factor of 0.7. The camera contains four mirrors; three of the mirrors are aspheres and the fourth is spherical. The design of the optical package has been constrained so that the angles of incidence and the variations in the angle of incidence of all rays allow for uniform multilayer coatings. The multilayers introduce a slight shift in image position and magnification. We have shown that a system aligned with visible light is also aligned at 13.4 nm. Each mirror must be fabricated with an RMS figure error of less than 0.25 nm and better than 0.2 nm RMS roughness. Optical surfaces that exceed each of these specifications individually have been fabricated. The success of EUVL requires that these specifications be met simultaneously.

  10. A novel double patterning approach for 30nm dense holes

    NASA Astrophysics Data System (ADS)

    Hsu, Dennis Shu-Hao; Wang, Walter; Hsieh, Wei-Hsien; Huang, Chun-Yen; Wu, Wen-Bin; Shih, Chiang-Lin; Shih, Steven

    2011-04-01

    Double Patterning Technology (DPT) was commonly accepted as the major workhorse beyond water immersion lithography for sub-38nm half-pitch line patterning before the EUV production. For dense hole patterning, classical DPT employs self-aligned spacer deposition and uses the intersection of horizontal and vertical lines to define the desired hole patterns. However, the increase in manufacturing cost and process complexity is tremendous. Several innovative approaches have been proposed and experimented to address the manufacturing and technical challenges. A novel process of double patterned pillars combined image reverse will be proposed for the realization of low cost dense holes in 30nm node DRAM. The nature of pillar formation lithography provides much better optical contrast compared to the counterpart hole patterning with similar CD requirements. By the utilization of a reliable freezing process, double patterned pillars can be readily implemented. A novel image reverse process at the last stage defines the hole patterns with high fidelity. In this paper, several freezing processes for the construction of the double patterned pillars were tested and compared, and 30nm double patterning pillars were demonstrated successfully. A variety of different image reverse processes will be investigated and discussed for their pros and cons. An economic approach with the optimized lithography performance will be proposed for the application of 30nm DRAM node.

  11. Gain measurements at 5 nm in nickel-like ytterbium

    SciTech Connect

    MacGowan, B.J.; Bourgade, J.L.; Combis, P.; Keane, C.J.; Louis-Jacquet, M.; Matthews, D.L.; Naccache, D.; Stone, G.; Thiell, G.; Whelan, D.A.

    1988-03-01

    Soft x-ray gain has been demonstrated at 5.03 nm within a laser produced plasma of Ni-like ytterbium. Experiments will also be described with higher Z Ni-like ions which can produce even shorter wavelength x-ray laser transition. 3 refs.

  12. 78 FR 61999 - New Mexico Disaster #NM-00037

    Federal Register 2010, 2011, 2012, 2013, 2014

    2013-10-10

    ... From the Federal Register Online via the Government Publishing Office SMALL BUSINESS ADMINISTRATION New Mexico Disaster NM-00037 AGENCY: U.S. Small Business Administration. ACTION: Notice. SUMMARY... State of New Mexico (FEMA- 4148-DR), dated 09/30/2013. Incident: Severe Storms and Flooding....

  13. 77 FR 41874 - New Mexico Disaster #NM-00025

    Federal Register 2010, 2011, 2012, 2013, 2014

    2012-07-16

    ... ADMINISTRATION New Mexico Disaster NM-00025 AGENCY: U.S. Small Business Administration. ACTION: Notice. SUMMARY: This is a notice of an Administrative declaration of a disaster for the State of New Mexico dated 07/09... adversely affected by the disaster: Primary Counties: Lincoln. Contiguous Counties: New Mexico: Chaves,...

  14. 77 FR 63409 - New Mexico Disaster Number NM-00029

    Federal Register 2010, 2011, 2012, 2013, 2014

    2012-10-16

    ... ADMINISTRATION New Mexico Disaster Number NM-00029 AGENCY: U.S. Small Business Administration. ACTION: Amendment... Assistance Only for the State of New Mexico (FEMA-4079-DR), dated 08/24/2012. Incident: Flooding. Incident... Non-Profit organizations in the State of NEW MEXICO, dated 08/24/2012, is hereby amended to...

  15. 77 FR 47907 - New Mexico Disaster #NM-00025

    Federal Register 2010, 2011, 2012, 2013, 2014

    2012-08-10

    ... ADMINISTRATION New Mexico Disaster NM-00025 AGENCY: U.S. Small Business Administration. ACTION: Amendment 1. SUMMARY: This is an amendment of the Administrative declaration of a disaster for the State of NEW MEXICO...'s declaration for the State of New Mexico, dated 07/09/2012 is hereby amended to establish...

  16. 78 FR 66982 - New Mexico Disaster #NM-00035

    Federal Register 2010, 2011, 2012, 2013, 2014

    2013-11-07

    ... From the Federal Register Online via the Government Publishing Office SMALL BUSINESS ADMINISTRATION New Mexico Disaster NM-00035 AGENCY: U.S. Small Business Administration. ACTION: Notice. SUMMARY... State of New Mexico (FEMA- 4152-DR), dated 10/29/2013. Incident: Severe storms, flooding, and...

  17. 77 FR 55523 - New Mexico Disaster #NM-00029

    Federal Register 2010, 2011, 2012, 2013, 2014

    2012-09-10

    ... From the Federal Register Online via the Government Publishing Office SMALL BUSINESS ADMINISTRATION New Mexico Disaster NM-00029 AGENCY: U.S. Small Business Administration. ACTION: Notice. SUMMARY... State of New Mexico (FEMA- 4079-DR), dated 08/24/2012. Incident: Flooding. Incident Period:...

  18. 76 FR 81553 - New Mexico Disaster Number NM-00024

    Federal Register 2010, 2011, 2012, 2013, 2014

    2011-12-28

    ... ADMINISTRATION New Mexico Disaster Number NM-00024 AGENCY: U.S. Small Business Administration. ACTION: Amendment... Assistance Only for the State of New Mexico (FEMA-4047-DR), dated 11/23/2011. Incident: Flooding. Incident... Non-Profit organizations in the State of New Mexico, dated 11/23/2011, is hereby amended to...

  19. 76 FR 18289 - New Mexico Disaster #NM-00020

    Federal Register 2010, 2011, 2012, 2013, 2014

    2011-04-01

    ... From the Federal Register Online via the Government Publishing Office SMALL BUSINESS ADMINISTRATION New Mexico Disaster NM-00020 AGENCY: U.S. Small Business Administration. ACTION: Notice. SUMMARY... State of New Mexico (FEMA- 1962-DR), dated 03/24/2011. Incident: Severe Winter Storm and Extreme...

  20. 76 FR 76801 - New Mexico Disaster #NM-00024

    Federal Register 2010, 2011, 2012, 2013, 2014

    2011-12-08

    ... From the Federal Register Online via the Government Publishing Office SMALL BUSINESS ADMINISTRATION New Mexico Disaster NM-00024 AGENCY: U.S. Small Business Administration. ACTION: Notice. SUMMARY... State of New Mexico (FEMA- 4047-DR), dated 11/23/2011. Incident: Flooding. Incident Period:...

  1. 78 FR 72141 - New Mexico Disaster Number NM-00037

    Federal Register 2010, 2011, 2012, 2013, 2014

    2013-12-02

    ... ADMINISTRATION New Mexico Disaster Number NM-00037 AGENCY: U.S. Small Business Administration. ACTION: Amendment... Assistance Only for the State of New Mexico (FEMA-4148-DR), dated 09/30/2013. Incident: Severe Storms and... Private Non-Profit organizations in the State of New Mexico, dated 09/30/2013, is hereby amended...

  2. 76 FR 2431 - New Mexico Disaster #NM-00016

    Federal Register 2010, 2011, 2012, 2013, 2014

    2011-01-13

    ... ADMINISTRATION New Mexico Disaster NM-00016 AGENCY: U.S. Small Business Administration. ACTION: Amendment 1... Only for the State of New Mexico (FEMA-1936-DR), dated 09/13/2010. Incident: Severe Storms and Flooding... Private Non-Profit organizations in the State of NEW MEXICO, dated 09/13/2010, is hereby amended...

  3. 75 FR 57538 - New Mexico Disaster # NM-00016

    Federal Register 2010, 2011, 2012, 2013, 2014

    2010-09-21

    ... From the Federal Register Online via the Government Publishing Office SMALL BUSINESS ADMINISTRATION New Mexico Disaster NM-00016 AGENCY: U.S. Small Business Administration. ACTION: Notice. SUMMARY... State of New Mexico (FEMA- 1936-DR), dated 09/13/2010. Incident: Severe Storms and Flooding....

  4. 78 FR 73581 - New Mexico Disaster Number NM-00035

    Federal Register 2010, 2011, 2012, 2013, 2014

    2013-12-06

    ... ADMINISTRATION New Mexico Disaster Number NM-00035 AGENCY: U.S. Small Business Administration. ACTION: Amendment... Assistance Only for the State of New Mexico (FEMA-4152-DR), dated 10/29/2013. Incident: Severe Storms... disaster declaration for Private Non-Profit organizations in the State of New Mexico, dated 10/29/2013,...

  5. Uncertainties of the Intensity of the 1130 nm Band of Water Vapor

    NASA Technical Reports Server (NTRS)

    Giver, L. P.; Pilewskie, P.; Gore, W. J.; Chackerian, C., Jr.; Varanasi, P.; Bergstrom, R.; Freedman, R. S.

    2001-01-01

    Belmiloud, et al have recently suggested that the HITRAN line intensities in the 1130 nm water vapor band are much too weak. Giver, et at corrected unit conversion errors to make the HITRAN intensities compatible with the original measurements of Mandin, et al, but Belmiloud, et al believe that many of those line intensity measurements were too weak, and they propose the total intensity of the 1130 nm water vapor band is 38% stronger than the sum of the HITRAN line intensities in this region. We have made independent assessments of this proposal using 2 spectra obtained with the Ames 25 meter base path White cell. The first was made using the moderate resolution (8 nm) solar spectral flux radiometer (SSFR) flight instrument with a White cell absorbing path of 506 meters and 10 torr water vapor pressure. Modeling this spectrum using the HITRAN linelist gives a reasonable match, and the model is not compatible when the HITRAN line intensities are increased by 38%. The second spectrum was obtained with a White cell path of 1106 meters and 12 torr water vapor pressure, using a Bomem FTIR with near Doppler width resolution. This spectrum is useful for measuring intensities of isolated weak lines to compare with the measurements of Mandin, et al. Unfortunately, as Belmiloud et al point out, at these conditions the strong lines are much too saturated for good intensity measurements. Our measurements of the weak lines are in reasonable agreement with those of Mandin, et al. Neither of our spectra supports the proposal of Belmiloud et al for a general 38% increase of the absorption intensity in the 1130 nm water vapor band.

  6. A study of OI 844.6 nm dayglow emission under geomagnetic storm conditions

    NASA Astrophysics Data System (ADS)

    Dharwan, Maneesha; Singh, Vir

    2015-06-01

    A comprehensive model is developed to study 844.6 nm dayglow emission. The Solar2000 EUV (extreme ultraviolet) flux model, neutral atmosphere model (NRLMSISE-00) and latest available cross-sections are incorporated in this model. The present model is used to study the effects of geomagnetic storm on the 844.6 nm dayglow emission at a low latitude station Tirunelveli (8.7°N, 77.8°E). Three geomagnetic storms which occurred during 23rd-27th August 2005, 13th-17th April 2006 and 1st-5th February 2008 are chosen in the present study. It is found that the volume emission rate (VER) shows a negative correlation with the Dst index for all the three geomagnetic storms. The present study also shows that the altitude of the peak emission rate does not vary with the activity of geomagnetic storm. The model predicts a positive correlation between the zenith intensity of 844.6 nm dayglow emission and atomic oxygen number density. The consistency of atomic oxygen number density obtained from the NRLMSISE-00 model during a geomagnetic storm is checked using the satellite measurements of Earle et al. (2013). It is found that the atomic oxygen number density given by NRLMSISE-00 model is significantly lower than the measured values. Consequently, the effect of atomic oxygen number density abundance on 844.6 nm dayglow emission is further studied by treating the atomic oxygen number density as a variable parameter in the present model. An increase of more than 50% in the zenith intensity above the normal level (before the onset of the storm) is found when the atomic oxygen number density which is obtained from NRLMSISE-00 model is doubled (under the limits of measurements).

  7. Sub-10 nm feature chromium photomasks for contact lithography patterning of square metal ring arrays

    NASA Astrophysics Data System (ADS)

    Park, Woongkyu; Rhie, Jiyeah; Kim, Na Yeon; Hong, Seunghun; Kim, Dai-Sik

    2016-03-01

    Advances in photolithographic processes have allowed semiconductor industries to manufacture smaller and denser chips. As the feature size of integrated circuits becomes smaller, there has been a growing need for a photomask embedded with ever narrower patterns. However, it is challenging for electron beam lithography to obtain <10 nm linewidths with wafer scale uniformity and a necessary speed. Here, we introduce a photolithography-based, cost-effective mask fabrication method based on atomic layer deposition and overhang structures for sacrificial layers. Using this method, we obtained sub-10 nm square ring arrays of side length 50 μm, and periodicity 100 μm on chromium film, on 1 cm by 1 cm quartz substrate. These patterns were then used as a contact-lithography photomask using 365 nm I-line, to generate metal ring arrays on silicon substrate.

  8. Sub-10 nm feature chromium photomasks for contact lithography patterning of square metal ring arrays.

    PubMed

    Park, Woongkyu; Rhie, Jiyeah; Kim, Na Yeon; Hong, Seunghun; Kim, Dai-Sik

    2016-01-01

    Advances in photolithographic processes have allowed semiconductor industries to manufacture smaller and denser chips. As the feature size of integrated circuits becomes smaller, there has been a growing need for a photomask embedded with ever narrower patterns. However, it is challenging for electron beam lithography to obtain <10 nm linewidths with wafer scale uniformity and a necessary speed. Here, we introduce a photolithography-based, cost-effective mask fabrication method based on atomic layer deposition and overhang structures for sacrificial layers. Using this method, we obtained sub-10 nm square ring arrays of side length 50 μm, and periodicity 100 μm on chromium film, on 1 cm by 1 cm quartz substrate. These patterns were then used as a contact-lithography photomask using 365 nm I-line, to generate metal ring arrays on silicon substrate. PMID:27025277

  9. Sub-10 nm feature chromium photomasks for contact lithography patterning of square metal ring arrays

    PubMed Central

    Park, Woongkyu; Rhie, Jiyeah; Kim, Na Yeon; Hong, Seunghun; Kim, Dai-Sik

    2016-01-01

    Advances in photolithographic processes have allowed semiconductor industries to manufacture smaller and denser chips. As the feature size of integrated circuits becomes smaller, there has been a growing need for a photomask embedded with ever narrower patterns. However, it is challenging for electron beam lithography to obtain <10 nm linewidths with wafer scale uniformity and a necessary speed. Here, we introduce a photolithography-based, cost-effective mask fabrication method based on atomic layer deposition and overhang structures for sacrificial layers. Using this method, we obtained sub-10 nm square ring arrays of side length 50 μm, and periodicity 100 μm on chromium film, on 1 cm by 1 cm quartz substrate. These patterns were then used as a contact-lithography photomask using 365 nm I-line, to generate metal ring arrays on silicon substrate. PMID:27025277

  10. High-average-power 266 nm generation with a KBe₂BO₃F₂ prism-coupled device.

    PubMed

    Wang, Lirong; Zhai, Naixia; Liu, Lijuan; Wang, Xiaoyang; Wang, Guiling; Zhu, Yong; Chen, Chuangtian

    2014-11-01

    High-average-power fourth harmonic generation (4thHG) of an Nd:YAG laser has been achieved by using a KBe₂BO₃F₂-prism-coupled device (KBBF-PCD) . The highest output power of 7.86 W at 266 nm was obtained with a conversion efficiency of 10%. To our knowledge, this is the highest power ever obtained by a KBBF-PCD. The stability of the 266 nm output power at 3.26 W was measured over a period of 60 minutes, and the standard deviation jitter of the average power was 1.4%. Moreover, the temperature bandwidth for KBBF was also measured at 266nm for the first time,which shows that KBBF has significant advantages in high power 4thHG compared to other major nonlinear optical crystals and is potential for UV applications. PMID:25401859

  11. Characteristics of 308 nm excimer laser activated arterial tissue photoemission under ablative and non-ablative conditions.

    PubMed

    Laufer, G; Wollenek, G; Rüeckle, B; Buchelt, M; Kuckla, C; Ruatti, H; Buxbaum, P; Fasol, R; Zilla, P

    1989-01-01

    The present study was designed to assess the characteristics of tissue photoemission obtained from normal and atherosclerotic segments of human postmortem femoral arteries by 308 nm excimer laser irradiation of 60 ns pulsewidth. Three ablative (20, 30, and 40 mJ/pulse) and three non-ablative (2.5, 5, and 10 mJ/pulse) energy fluences were employed. Both the activating laser pulses and the induced photoemission were guided simultaneously over one and the same 1,000 micron core optical fiber that was positioned in direct tissue contact perpendicular to the vascular surface. The spectral lineshape of normal arterial and noncalcified atherosclerotic structures was characterized by a broad-continuum, double-peak emission of relevant intensity between wavelengths of 360 and 500 nm, with the most prominent emission in the range of 400-415 (407 nm peak) and 430-445 nm (437 nm peak). Fibrous and lipid atherosclerotic lesions, however, exhibited a significantly reduced intensity at 437 nm compared to normal artery layers (P less than 0.001), expressed as a 407/437 nm ratio of 1.321 +/- 0.075 for fibrous and 1.392 +/- 0.104 for lipid lesions. Normal artery components presented with approximately equal intensity at both emission peaks (407/437 nm ratio: intima, 1.054 +/- 0.033; media, 1.024 +/- 0.019; adventitia, 0.976 +/- 0.021). Comparison of spectral lineshape obtained under various energy fluences within a group of noncalcified tissues disclosed no substantial difference using the 407/437 nm ratio (P greater than 0.05). In contrast, calcified lesions revealed high-intensity multiple-line (397, 442, 461, and 528 nm) emission spectra under ablative energy fluences, whereas a low-intensity broad-continuum, single-peak spectrum resulted from irradiation beyond the ablation threshold. Thus, these findings suggest fluorescence phenomena for broad-continuum spectra, and plasma emission for multiple-line spectra as an underlying photodynamic process. Regardless of the activating

  12. Double-Edge Molecular Measurement of Lidar Wind Profiles at 355 nm

    NASA Technical Reports Server (NTRS)

    Flesia, Cristina; Korb, C. Laurence; Hirt, Christian; Einaudi, Franco (Technical Monitor)

    2000-01-01

    We built a direct detection Doppler lidar based on the double-edge molecular technique and made the first molecular based wind measurements using the eyesafe 355 nm wavelength. Three etalon bandpasses are obtained with Step etalons on a single pair of etalon plates. Long-term frequency drift of the laser and the capacitively stabilized etalon is removed by locking the etalon to the laser frequency. We use a low angle design to avoid polarization effects. Wind measurements of 1 to 2 m/s accuracy are obtained to 10 km altitude with 5 mJ of laser energy, a 750s integration, and a 25 cm telescope. Good agreement is obtained between the lidar and rawinsonde measurements.

  13. Single-frequency linearly-polarized 1083 nm all fiber nanosecond laser

    NASA Astrophysics Data System (ADS)

    Su, Rongtao; Xu, Jiangmin; Zhou, Pu; Ji, Xiang; Xu, Xiaojun

    2012-12-01

    Single-frequency linearly-polarized 1083 nm all fiber nanosecond master-oscillator power amplifier laser system is demonstrated. A ring laser, whose key components are one saturable absorber and two polarization controllers, delivers a single-frequency continuous wave laser. Using an electro-optic modulator as the modulator, the pulse laser seed is obtained by modulating the CW laser. By amplifying the pulse seed to the average power of 61.6 W in three stages, a single-frequency linearly-polarized laser with pulse duration of 16 ns, repetition rate of 10 MHz and pulse energy of 6.16 μJ is obtained. No nonlinear effect is observed in our experiment. Higher output power can be obtained by increasing LDs of the main amplifier.

  14. How to obtain confirmation for revalidation.

    PubMed

    Middleton, Lyn; Llewellyn, Denise

    2016-07-27

    Rationale and key points This is the seventh in a series of eight articles providing information about the Nursing and Midwifery Council revalidation process. This article focuses on obtaining confirmation for revalidation. » Revalidation is a mandatory process for nurses and midwives, enabling them to demonstrate their ability to practise safely and effectively. » Confirmation provides assurance that nurses and midwives have met the requirements of revalidation. » Confirmation does not involve making judgements about whether a nurse or midwife is fit to practise. Reflective activity 'How to' revalidate articles can help to update your practice and provide information about the revalidation process, including how you can obtain confirmation for revalidation. Reflect on and write a short account of: 1. The information that nurses and midwives are required to collect to meet the revalidation requirements. 2. How you could use this article to educate your colleagues. Subscribers can upload their reflective accounts at: rcni.com/portfolio. PMID:27461327

  15. Processing to obtain high-purity gallium

    NASA Astrophysics Data System (ADS)

    Bautista, Renato G.

    2003-03-01

    Gallium has become increasingly popular as a substrate material for electronic devices. Aside from ore, gallium can be obtained from such industrial sources as the Bayer process caustic liquor that is a byproduct of bauxite processing, flue dust removed from the fume-collection system in plants that produce aluminum by the electrolytic process, zinc refinery residues, gallium scrap materials, and coal fly ash. The purification process for gallium can start with solvent-extraction processes where the concentrations of impurities, especially metals, are reduced to the ppm range. This article describes how ultra-purification techniques can be employed to reduce the undesirable impurities to the low ppb range. The various procedures described give an idea as to the extent of work needed to obtain and prepare high-purity gallium for electronic application.

  16. Phase-matched frequency conversion below 150 nm in KBe2BO3F2.

    PubMed

    Nakazato, Tomoharu; Ito, Isao; Kobayashi, Yohei; Wang, Xiaoyang; Chen, Chuangtian; Watanabe, Shuntaro

    2016-07-25

    Sum frequency mixing has been demonstrated below 150 nm in KBeBO3F2 by using the fundamental with its fourth harmonic of a 6 kHz Ti: sapphire laser system. The wavelength of 149.8 nm is the shortest ever obtained to our knowledge by phase matching in nonlinear crystals. The output powers were 3.6 μW at 149.8 nm and 110 μW at 154.0 nm, respectively. The phase matching angles measured from 149.8 to 158.1 nm are larger by 3-4 degrees than those expected from the existing Sellmeier equation. The measured transmission spectra of KBeBO3F2 crystals support the generation of coherent radiation below 150 nm. PMID:27464165

  17. Cryogenic Lifetime Studies of 130 nm and 65 nm CMOS Technologies for High-Energy Physics Experiments

    SciTech Connect

    Hoff, James R.; Deptuch, G. W.; Wu, Guoying; Gui, Ping

    2015-06-04

    The Long Baseline Neutrino Facility intends to use unprecedented volumes of liquid argon to fill a time projection chamber in an underground facility. Research is under way to place the electronics inside the cryostat. For reasons of efficiency and economics, the lifetimes of these circuits must be well in excess of 20 years. The principle mechanism for lifetime degradation of MOSFET devices and circuits operating at cryogenic temperatures is hot carrier degradation. Choosing a process technology that is, as much as possible, immune to such degradation and developing design techniques to avoid exposure to such damage are the goals. This, then, requires careful investigation and a basic understanding of the mechanisms that underlie hot carrier degradation and the secondary effects they cause in circuits. In this work, commercially available 130 nm and 65 nm nMOS transistors operating at cryogenic temperatures are investigated. Our results show that both technologies achieve the lifetimes required by the experiment. Minimal design changes are necessary in the case of the 130 nm process and no changes whatsoever are necessary for the 65 nm process.

  18. Photoelectrochemical and physical properties of tungsten trioxide films obtained by aerosol pyrolysis

    SciTech Connect

    Sadale, S.B.; Chaqour, S.M.; Gorochov, O.; Neumann-Spallart, M.

    2008-06-03

    Aerosol pyrolysis (AP) was used for preparing semiconducting films of tungsten trioxide using peroxotungstic acid as a precursor. The films were characterized by SEM, XRD, and by their photoelectrochemical response. Porous, polycrystalline (monoclinic) films of thickness up to 3 {mu}m were prepared. An incident photon to current efficiency (IPCE) of 0.55 at 365 nm was obtained for films of 1 {mu}m thickness on conducting F:SnO{sub 2}/glass substrates under depletion conditions, in junctions with aqueous electrolytes. The spectral (photocurrent) response extended into the visible region (up to 470 nm) which is of importance for solar applications like photocatalysis.

  19. Double exposure technique for 45nm node and beyond

    NASA Astrophysics Data System (ADS)

    Hsu, Stephen; Park, Jungchul; Van Den Broeke, Douglas; Chen, J. Fung

    2005-11-01

    The technical challenges in using F2 lithography for the 45nm node, along with the insurmountable difficulties in EUV lithography, has driven the semiconductor chipmaker into the low k1 lithography era under the pressure of ever decreasing feature sizes. Extending lithography towards lower k1 puts heavy demand on the resolution enhancement technique (RET), exposure tool, and the need for litho friendly design. Hyper numerical aperture (NA) exposure tools, immersion, and double exposure techniques (DET's) are the promising methods to extend lithography manufacturing to the 45nm node at k1 factors below 0.3. Scattering bars (SB's) have become an integral part of the lithography process as chipmakers move to production at ever lower k1 factors. To achieve better critical dimension (CD) control, polarization is applied to enhance the image contrast in the preferential imaging orientation, which increases the risk of SB printability. The optimum SB width is approximately (0.20 ~ 0.25)*(λ/NA). When the SB width becomes less than the exposure wavelength on the 4X mask, Kirchhoff's scalar theory under predicts the SB intensity. The optical weighting factor of the SB increases (Figure 1b) and the SB's become more susceptible to printing. Meanwhile, under hyper NA conditions, the effectiveness of "subresolution" SB's is significantly diminished. A full-sized scattering bars (FSB) scheme becomes necessary. Double exposure methods, such as using ternary 6% attenuated PSM (attPSM) for DDL, are good imaging solutions that can reach and likely go beyond the 45nm node. Today DDL, using binary chrome masks, is capable of printing 65 nm device patterns. In this work, we investigate the use of DET with 6% attPSM masks to target 45nm node device. The SB scalability and printability issues can be taken cared of by using "mutual trimming", i.e., with the combined energy from the two exposures. In this study, we share our findings of using DET to pattern a 45nm node device design with

  20. Theoretical and experimental investigations of nanosecond 177.3 nm deep-ultraviolet light by second harmonic generation in KBBF

    NASA Astrophysics Data System (ADS)

    Yang, F.; Wang, Z.; Zhou, Y.; Li, F.; Xu, J.; Xu, Y.; Cheng, X.; Lu, Y.; Bo, Y.; Peng, Q.; Cui, D.; Zhang, X.; Wang, X.; Zhu, Y.; Xu, Z.

    2009-08-01

    We have presented theoretical and experimental investigations of nanosecond (ns) deep-ultraviolet (DUV) 177.3 nm radiation by means of second harmonic generation (SHG) from a frequency-tripled Nd:YAG laser (355 nm, 49 ns and 10 kHz) in KBe2BO3F2 (KBBF) nonlinear crystal for the first time. A DUV KBBF-SHG numerical model, accounting for linear absorption, pump depletion, beam spatial birefringent walk-off and diffraction, is performed in the Gaussian approximation of spatial and temporal profiles. In the experiment, a maximum average output power of 14.1 mW at 177.3 nm was obtained. The dependence of 177.3 nm output power on the 355 nm pump power was simulated. The calculated results are in good agreement with the measured data. We used the model further to investigate the optical conversion efficiency, pulse width, beam spatial intensity profile and beam quality factor of the generated 177.3 nm light, in particular the effect of beam birefringent walk-off.

  1. Obtaining growth hormone from calf blood

    NASA Technical Reports Server (NTRS)

    Kalchev, L. A.; Ralchev, K. K.; Nikolov, I. T.

    1979-01-01

    The preparation of a growth hormone from human serum was used for the isolation of the hormone from calf serum. The preparation was biologically active - it increased the quantity of the free fatty acids released in rat plasma by 36.4 percent. Electrophoresis in Veronal buffer, ph 8.6, showed the presence of a single fraction having mobility intermediate between that of alpha and beta globulins. Gel filtration through Sephadex G 100 showed an elutriation curve identical to that obtained by the growth hormone prepared from pituitary glands.

  2. Single, composite, and ceramic Nd:YAG 946-nm lasers

    NASA Astrophysics Data System (ADS)

    Lan, Rui-Jun; Yang, Guang; Zheng-Ping, Wang

    2015-06-01

    Single, composite crystal and ceramic continuous wave (CW) 946-nm Nd:YAG lasers are demonstrated, respectively. The ceramic laser behaves better than the crystal laser. With 5-mm long ceramic, a CW output power of 1.46 W is generated with an optical conversion efficiency of 13.9%, while the slope efficiency is 17.9%. The optimal ceramic length for a 946-nm laser is also calculated. Project supported by the National Natural Science Foundation of China (Grant No. 61405171), the Natural Science Foundation of Shandong Province, China (Grant No. ZR2012FQ014), and the Science and Technology Program of the Shandong Higher Education Institutions of China (Grant No. J13LJ05).

  3. Performance of Thin Borosilicate Glass Sheets at 351-nm

    SciTech Connect

    Whitman, P K; Hahn, D; Soules, T; Norton, M; Dixit, S; Donohue, G; Folta, J; Hollingsworth, W; Mainschein-Cline, M

    2004-11-11

    Previously, we reported preliminary results for commercial thin borosilicate glass sheets evaluated for use as a frequently-replaced optic to separate the radiation and contamination produced by the inertial confinement fusion experiments in the National Ignition Facility target chamber from the expensive precision laser optics which focus and shape the 351-nm laser beam. The goal is identification of low cost substrates that can deliver acceptable beam energy and focal spots to the target. The two parameters that dominate the transmitted beam quality are the transmitted wave front error and 351-nm absorption. Commercial materials and fabrication processes have now been identified which meet the beam energy and focus requirements for all of the missions planned for the National Ignition Facility. We present the first data for use of such an optic on the National Ignition Facility laser.

  4. Novel single-layer photoresist containing cycloolefins for 193 nm

    NASA Astrophysics Data System (ADS)

    Park, Joo Hyeon; Seo, Dong-Chul; Kim, Ki-Dae; Park, Sun-Yi; Kim, Seong-Ju; Lee, Hosull; Jung, Jae Chang; Bok, Cheol-Kyu; Baik, Ki-Ho

    1998-06-01

    New matrix resins containing maleic anhydride and cycloolefin units for ArF excimer laser resist have been developed. Several series of these matrix resins having good dry-etching durability were prepared by free radical polymerization using AlBN as free radical initiator. All of the resists using the matrix resins revealed good coating uniformity and adhesion to silicon wafer, and were readily soluble in a variety of resist solvents such as MMP, EEP, PGMEA and EL. In preliminary 193 nm testing a resist formulated with the matrix resins sulfonium triflate as photoacid generator afforded positive images with 0.14 micrometers L/S resolution. In this paper, we will discuss the polymerization results and lithographic properties for 193 nm exposure tool.

  5. Evaluation of KLA-Tencor LMS IPRO5 beta system for 22nm node registration and overlay applications

    NASA Astrophysics Data System (ADS)

    Ferber, M.; Laske, F.; Röth, K.-D.; Adam, D.

    2011-11-01

    Using various technical tricks, 193nm lithography has been pushed for the 22nm logic node. For optical and EUV lithography, the International Technology Roadmap for Semiconductors (ITRS [1]) requests a registration error below 3.8 nm for masks for single-patterning layers. Double patterning further reduces the tolerable pattern placement error to < 2.7 nm for each mask of a pair that forms one layer on the wafer. For mask metrology on the 2x node, maintaining a precision-to-tolerance (P/T) ratio of 0.25 will be challenging. The total measurement uncertainty has to be significantly below 1.0nm. In this work, results obtained during the LMS IPRO5 beta system evaluation are presented. LMS IPRO5 beta system evaluation is part of the CDUR32 project, funded by the German Federal Ministry of Education and Research. A major improvement to previous LMS IPRO generations is the new laser illumination system, which significantly improves optical resolution and contrast (especially on EUV substrates). Therefore, optical resolution and measurement capability are evaluated using standard registration targets, in-die wafer overlay targets, and arbitrary shaped features on different substrates comprising EUV and binary MoSi masks. Position measurement uncertainty for the new center of gravity (CofG) measurement algorithm, important for in-die measurement capability, is evaluated. The results are compared with results obtained using the traditional edge detection algorithm.

  6. 308-nm Excimer laser treatment of palmoplantar psoriasis.

    PubMed

    Goldberg, David J; Chwalek, Jennifer; Hussain, Mussarrat

    2011-04-01

    Psoriasis is a chronic inflammatory condition affecting 1-3% of the population. The incidence of palmoplantar involvement has been estimated to be between 2.8% and 40.9%. Significant psychosocial distress and difficulty performing activities of daily living can result. Treatment is often challenging. Traditional treatments include topical steroids, anthralin, calcipotriene, PUVA, methotrexate, cyclosporine, retinoids and biologics. In this case series, we report our success with the 308-nm excimer laser in the treatment of palmoplantar psoriasis. PMID:21401376

  7. Measurement of Laser Damage Threshold of 355-nm Antireflection Coating

    NASA Astrophysics Data System (ADS)

    Tamura, Shigeharu; Kimura, Saburo; Sato, Yoshiyuki; Otani, Minoru; Yoshida, Hidetsugu; Yoshida, Kunio

    1989-06-01

    The laser damage thresholds of various types of antireflection (AR) coatings for an UV (355-nm) laser system were measured. Among them, the coatings consisting of two low-index materials, SiO2 and MgF2, had the highest average thresholds: 2.1 J/cm2 on fused silica substrates and 2.6 J/cm2 on sapphire substrates. The SiO2/MgF2 coating is hopeful for UV laser component.

  8. The polarization properties of Fe II 614.9 nm

    NASA Technical Reports Server (NTRS)

    Lites, Bruce W.

    1993-01-01

    The anomalous Zeeman splitting of the Fe II line at 614.9 nm results in four unusual properties of the polarization signature of this line in the presence of magnetic fields: the absence of linear polarization, no magnetooptical effect, the independence of intensity at line center from the inclination of the field, and a depolarizing self-absorption. The origin of these properties is illustrated in terms of the transfer of line radiation in an idealized solar atmosphere.

  9. Hard x-ray Zernike microscopy reaches 30 nm resolution.

    SciTech Connect

    Chen, Y.; Chen, T.; Yi, J.; Chu, Y.; Lee, W.-K.; Wang, C.; Kempson, I.; Hwu, Y.; Gajdosik, V.; Margaritondo, G.

    2011-03-30

    Since its invention in 1930, Zernike phase contrast has been a pillar in optical microscopy and more recently in x-ray microscopy, in particular for low-absorption-contrast biological specimens. We experimentally demonstrate that hard-x-ray Zernike microscopy now reaches a lateral resolution below 30?nm while strongly enhancing the contrast, thus opening many new research opportunities in biomedicine and materials science.

  10. Hard x-ray Zernike Microscopy Reaches 30 nm Resolution

    SciTech Connect

    Chen, Y.T.; Chu, Y.; Chen, T-Y.; Yi, J.; Lee, W-K.; Wang, C-L.; Kempson, I. M.; Hwu, Y.; Gajdosik, V.; Margaritondo, G.

    2011-03-30

    Since its invention in 1930, Zernike phase contrast has been a pillar in optical microscopy and more recently in x-ray microscopy, in particular for low-absorption-contrast biological specimens. We experimentally demonstrate that hard-x-ray Zernike microscopy now reaches a lateral resolution below 30 nm while strongly enhancing the contrast, thus opening many new research opportunities in biomedicine and materials science.

  11. 32 nm logic patterning options with immersion lithography

    NASA Astrophysics Data System (ADS)

    Lai, K.; Burns, S.; Halle, S.; Zhuang, L.; Colburn, M.; Allen, S.; Babcock, C.; Baum, Z.; Burkhardt, M.; Dai, V.; Dunn, D.; Geiss, E.; Haffner, H.; Han, G.; Lawson, P.; Mansfield, S.; Meiring, J.; Morgenfeld, B.; Tabery, C.; Zou, Y.; Sarma, C.; Tsou, L.; Yan, W.; Zhuang, H.; Gil, D.; Medeiros, D.

    2008-03-01

    The semiconductor industry faces a lithographic scaling limit as the industry completes the transition to 1.35 NA immersion lithography. Both high-index immersion lithography and EUV lithography are facing technical challenges and commercial timing issues. Consequently, the industry has focused on enabling double patterning technology (DPT) as a means to circumvent the limitations of Rayleigh scaling. Here, the IBM development alliance demonstrate a series of double patterning solutions that enable scaling of logic constructs by decoupling the pattern spatially through mask design or temporally through innovative processes. These techniques have been successfully employed for early 32nm node development using 45nm generation tooling. Four different double patterning techniques were implemented. The first process illustrates local RET optimization through the use of a split reticle design. In this approach, a layout is decomposed into a series of regions with similar imaging properties and the illumination conditions for each are independently optimized. These regions are then printed separately into the same resist film in a multiple exposure process. The result is a singly developed pattern that could not be printed with a single illumination-mask combination. The second approach addresses 2D imaging with particular focus on both line-end dimension and linewidth control [1]. A double exposure-double etch (DE2) approach is used in conjunction with a pitch-filling sacrificial feature strategy. The third double exposure process, optimized for via patterns also utilizes DE2. In this method, a design is split between two separate masks such that the minimum pitch between any two vias is larger than the minimum metal pitch. This allows for final structures with vias at pitches beyond the capability of a single exposure. In the fourth method,, dark field double dipole lithography (DDL) has been successfully applied to BEOL metal structures and has been shown to be

  12. Step and flash imprint lithography for sub-100-nm patterning

    NASA Astrophysics Data System (ADS)

    Colburn, Matthew; Grot, Annette; Amistoso, Marie N.; Choi, Byung J.; Bailey, Todd C.; Ekerdt, John G.; Sreenivasan, S. V.; Hollenhorst, James; Willson, C. Grant

    2000-07-01

    Step and Flash Imprint Lithography (SFIL) is an alternative to photolithography that efficiently generates high aspect-ratio, sub-micron patterns in resist materials. Other imprint lithography techniques based on physical deformation of a polymer to generate surface relief structures have produced features in PMMA as small as 10 nm, but it is very difficult to imprint large depressed features or to imprint a thick films of resist with high aspect-ratio features by these techniques. SFIL overcomes these difficulties by exploiting the selectivity and anisotropy of reactive ion etch (RIE). First, a thick organic 'transfer' layer (0.3 micrometer to 1.1 micrometer) is spin coated to planarize the wafer surface. A low viscosity, liquid organosilicon photopolymer precursor is then applied to the substrate and a quartz template applied at 2 psi. Once the master is in contact with the organosilicon solution, a crosslinking photopolymerization is initiated via backside illumination with broadband UV light. When the layer is cured the template is removed. This process relies on being able to imprint the photopolymer while leaving the minimal residual material in the depressed areas. Any excess material is etched away using a CHF3/He/O2 RIE. The exposed transfer layer is then etched with O2 RIE. The silicon incorporated in the photopolymer allows amplification of the low aspect ratio relief structure in the silylated resist into a high aspect ratio feature in the transfer layer. The aspect ratio is limited only by the mechanical stability of the transfer layer material and the O2 RIE selectivity and anisotropy. This method has produced 60 nm features with 6:1 aspect ratios. This lithography process was also used to fabricate alternating arrays of 100 nm Ti lines on a 200 nm pitch that function as efficient micropolarizers. Several types of optical devices including gratings, polarizers, and sub-wavelength structures can be easily patterned by SFIL.

  13. Polarimetry diagnostic on OMEGA EP using a 10-ps, 263-nm probe beam

    SciTech Connect

    Davies, A. Haberberger, D.; Boni, R.; Ivancic, S.; Brown, R.; Froula, D. H.

    2014-11-15

    A polarimetry diagnostic was built and characterized for magnetic-field measurements in laser-plasma experiments on the OMEGA EP laser. This diagnostic was built into the existing 4ω (263-nm) probe system that employs a 10-ps laser pulse collected with an f/4 imaging system. The diagnostic measures the rotation of the probe beam's polarization. The polarimeter uses a Wollaston prism to split the probe beam into orthogonal polarization components. Spatially localized intensity variations between images indicate polarization rotation. Magnetic fields can be calculated by combining the polarimetry data with the measured plasma density profile obtained from angular filter refractometry.

  14. Theoretical study of the neuromedin U-8 (NmU-8) neuropeptide from porcine spinal cord

    NASA Astrophysics Data System (ADS)

    Alieva, Irada N.; Isakova, Nigar A.; Gojayev, Niftali M.

    2004-09-01

    The spatial organization and conformational properties of the neuromedin U-8 (NmU-8) neuropeptide from porcine spinal cord have been established by the method of molecular mechanics. The conformational states corresponding to the local minimum of the whole molecule potential energy are obtained. The backbone structure comprises a type II β-turn formed by residues Arg 5-Pro 6-Arg 7-Asn 8. A large flexibility of the Tyr 1-Phe 2-Leu 3-Phe 4 amino acids sequence in contrast to other segment of the molecule was observed.

  15. Fast Fabrication of Sub-200-nm Nanogrooves Using Liquid Crystal Material.

    PubMed

    Kim, Dae Seok; Cha, Yun Jeong; Gim, Min-Jun; Yoon, Dong Ki

    2016-05-11

    Self-assembly of soft materials attracts keen interest for patterning applications owing to its ease and spontaneous behavior. We report the fabrication of nanogrooves using sublimation and recondensation of liquid crystal (LC) materials. First, well-aligned smectic LC structures are obtained on the micron-scale topographic patterns of the microchannel; then, the sublimation and recondensation process directly produces nanogrooves having sub-200-nm scale. The entire process can be completed in less than 30 min. After it is replicated using an ultraviolet-curable polymer, our platform can be used as an alignment layer to control other guest LC materials. PMID:27111040

  16. Poly(ethylene terephthalate) surface modification by deep UV (172 nm) irradiation

    SciTech Connect

    Zhengmao Zhua; Michael J. Kelley

    2004-09-01

    The prospects of obtaining desired surface-mediated characteristics while retaining bulk-mediated physical properties and avoiding potential environmental issues with wet chemical technology lends considerable appeal to photochemical approaches. We investigated the response of poly(ethylene terephthalate) to 172 nm UV from a xenon excimer lamp in the absence of oxygen, using XPS, ToF/SIMS, and AFM. The main effects are increasing loss of a C=O moiety and carboxylic acid production without effect on topography up to a total fluence of 16 J/cm2. Above this level no further change in surface chemistry was evident, but surfaces became rougher, suggesting the onset of etching.

  17. Hydrogen depth profiling with sub-nm resolution in high-resolution ERD

    NASA Astrophysics Data System (ADS)

    Kimura, Kenji; Nakajima, Kaoru; Imura, Hideki

    1998-05-01

    A depth resolution of 0.28 nm is obtained in a depth profile of hydrogen in silicon using a newly developed high-resolution elastic recoil detection (ERD) system. The system consists of a standard 90° sector magnetic spectrometer (energy resolution ˜0.1%) for high-resolution measurement and an electrostatic deflector for blocking scattered incident ions without disturbing the energy resolution. The system is very simple as compared with other high-resolution ERD systems and the data acquisition time is reasonably short.

  18. Revised Classification for SN 2007nm/PQT 071008:224527+103932

    NASA Astrophysics Data System (ADS)

    Djorgovski, S. G.; Drake, A. J.; Mahabal, A.; Donalek, C.; Glikman, E.; Graham, M. J.; Williams, R.; Baltay, C.; Rabinowitz, D.; Bauer, A.; Scalzo, R.; Ellman, N.; Jerke, J.; Thomas, R. C.; Nugent, P.; Hennawi, J.; Myers, A.; Allan, A.; Steele, I.; Brown, T.; PQ Survey Team

    2007-10-01

    We report a revised classification of SN 2007nm (Palomar-QUEST transient PQT 071008:224527+103932, Drake et al. ATEL#1234) based on additional spectroscopy beyond that reported by Djorgovski et al. (ATEL#1240). Using spectra obtained by the SuperNova Integral Field Spectrograph on the 2.2-meter University of Hawaii Telescope, the Nearby Supernova Factory has observed that strong a Si II 6355 feature has not developed, and that the spectrum is more similar to that of a Type Ic supernova at an approximate redshift of z = 0.04.

  19. Temperature-dependent 780-nm laser absorption by engineering grade aluminum, titanium, and steel alloy surfaces

    SciTech Connect

    Rubenchik, Alexander M.; Wu, Sheldon S. Q.; Kanz, V. Keith; LeBlanc, Mary M.; Lowdermilk, W. Howard; Rotter, Mark D.; Stanley, Joel R.

    2014-07-17

    When modeling laser interaction with metals for various applications it requires a knowledge of absorption coefficients for real, commercially available materials with engineering grade (unpolished, oxidized) surfaces. But, most currently available absorptivity data pertain to pure metals with polished surfaces or vacuum-deposited thin films in controlled atmospheres. A simple laboratory setup is developed for the direct calorimetric absorptivity measurements using a diode-array laser emitting at 780 nm. A scheme eliminating the effect of convective and radiative losses is implemented. Futhermore, the obtained absorptivity results differ considerably from existing data for polished pure metals and are essential for the development of predictive laser-material interaction models.

  20. OH(A-X) fluorescence from photodissociative excitation of HO2 at 157.5 nm

    NASA Technical Reports Server (NTRS)

    Suto, M.; Ye, C.; Mitchell, M. J.; Lee, L. C.

    1988-01-01

    The OH(A-X) fluorescence from photodissociative excitation of HO2 by F2 laser photons (157.5 nm) was observed and compared with the OH fluorescence spectra of H2O2 and the O2+CH3OH mixture. The rotational population distributions of OH(A) were obtained from the fluorescence spectra. The most populated levels are J = 4 for photodissociative excitation of HO2, J = 20 for H2O2, and J = 21 for the O2+CH3OH mixture. The fluorescence from the gas mixture is attributed to the O + H recombination for which the atoms are produced from photodissociation of parent molecules.