Science.gov

Sample records for 3n161 mos transistors

  1. Focused Ion Beam Induced Effects on MOS Transistor Parameters

    SciTech Connect

    Abramo, Marsha T.; Antoniou, Nicholas; Campbell, Ann N.; Fleetwood, Daniel M.; Hembree, Charles E.; Jessing, Jeffrey R.; Soden, Jerry M.; Swanson, Scot E.; Tangyunyong, Paiboon; Vanderlinde, William E.

    1999-07-28

    We report on recent studies of the effects of 50 keV focused ion beam (FIB) exposure on MOS transistors. We demonstrate that the changes in value of transistor parameters (such as threshold voltage, V{sub t}) are essentially the same for exposure to a Ga+ ion beam at 30 and 50 keV under the same exposure conditions. We characterize the effects of FIB exposure on test transistors fabricated in both 0.5 {micro}m and 0.225 {micro}m technologies from two different vendors. We report on the effectiveness of overlying metal layers in screening MOS transistors from FIB-induced damage and examine the importance of ion dose rate and the physical dimensions of the exposed area.

  2. Single-layer MoS2 transistors.

    PubMed

    Radisavljevic, B; Radenovic, A; Brivio, J; Giacometti, V; Kis, A

    2011-03-01

    Two-dimensional materials are attractive for use in next-generation nanoelectronic devices because, compared to one-dimensional materials, it is relatively easy to fabricate complex structures from them. The most widely studied two-dimensional material is graphene, both because of its rich physics and its high mobility. However, pristine graphene does not have a bandgap, a property that is essential for many applications, including transistors. Engineering a graphene bandgap increases fabrication complexity and either reduces mobilities to the level of strained silicon films or requires high voltages. Although single layers of MoS(2) have a large intrinsic bandgap of 1.8 eV (ref. 16), previously reported mobilities in the 0.5-3 cm(2) V(-1) s(-1) range are too low for practical devices. Here, we use a halfnium oxide gate dielectric to demonstrate a room-temperature single-layer MoS(2) mobility of at least 200 cm(2) V(-1) s(-1), similar to that of graphene nanoribbons, and demonstrate transistors with room-temperature current on/off ratios of 1 × 10(8) and ultralow standby power dissipation. Because monolayer MoS(2) has a direct bandgap, it can be used to construct interband tunnel FETs, which offer lower power consumption than classical transistors. Monolayer MoS(2) could also complement graphene in applications that require thin transparent semiconductors, such as optoelectronics and energy harvesting. PMID:21278752

  3. Metal Oxide Silicon /MOS/ transistors protected from destructive damage by wire

    NASA Technical Reports Server (NTRS)

    Deboo, G. J.; Devine, E. J.

    1966-01-01

    Loop of flexible, small diameter, nickel wire protects metal oxide silicon /MOS/ transistors from a damaging electrostatic potential. The wire is attached to a music-wire spring, slipped over the MOS transistor case, and released so the spring tensions the wire loop around all the transistor leads, shorting them together. This allows handling without danger of damage.

  4. Physics-based stability analysis of MOS transistors

    NASA Astrophysics Data System (ADS)

    Ferrara, A.; Steeneken, P. G.; Boksteen, B. K.; Heringa, A.; Scholten, A. J.; Schmitz, J.; Hueting, R. J. E.

    2015-11-01

    In this work, a physics-based model is derived based on a linearization procedure for investigating the electrical, thermal and electro-thermal instability of power metal-oxide-semiconductor (MOS) transistors. The proposed model can be easily interfaced with a circuit or device simulator to perform a failure analysis, making it particularly useful for power transistors. Furthermore, it allows mapping the failure points on a three-dimensional (3D) space defined by the gate-width normalized drain current, drain voltage and junction temperature. This leads to the definition of the Safe Operating Volume (SOV), a powerful frame work for making failure predictions and determining the main root of instability (electrical, thermal or electro-thermal) in different bias and operating conditions. A comparison between the modeled and the measured SOV of silicon-on-insulator (SOI) LDMOS transistors is reported to support the validity of the proposed stability analysis.

  5. Performance potential and limit of MoS2 transistors.

    PubMed

    Li, Xuefei; Yang, Lingming; Si, Mengwei; Li, Sichao; Huang, Mingqiang; Ye, Peide; Wu, Yanqing

    2015-03-01

    High-performance MoS2 transistors scaled down to 100 nm are studied at various temperatures down to 20 K, where a highest drive current of 800 μA μm(-1) can be achieved. Extremely low electrical noise of 2.8 × 10(-10) μm(2) Hz(-1) at 10 Hz is also achieved at room temperature. Furthermore, a negative differential resistance behavior is experimentally observed and its origin of self-heating is identified using pulsed-current-voltage measurements. PMID:25586919

  6. Tuning the threshold voltage of MoS2 field-effect transistors via surface treatment.

    PubMed

    Leong, Wei Sun; Li, Yida; Luo, Xin; Nai, Chang Tai; Quek, Su Ying; Thong, John T L

    2015-06-28

    Controlling the threshold voltage (Vth) of a field-effect transistor is important for realizing robust logic circuits. Here, we report a facile approach to achieve bidirectional Vth tuning of molybdenum disulfide (MoS2) field-effect transistors. By increasing and decreasing the amount of sulfur vacancies in the MoS2 surface, the Vth of MoS2 transistors can be left- and right-shifted, respectively. Transistors fabricated on perfect MoS2 flakes are found to exhibit a two-fold enhancement in mobility and a very positive Vth (18.5 ± 7.5 V). More importantly, our elegant hydrogen treatment is able to tune the large Vth to a small value (∼0 V) without any performance degradation simply by reducing the atomic ratio of S : Mo slightly; in other words, it creates a certain amount of sulfur vacancies in the MoS2 surface, which generate defect states in the band gap of MoS2 that mediates conduction of a MoS2 transistor in the subthreshold regime. First-principles calculations further indicate that the defect band's edge and width can be tuned according to the vacancy density. This work not only demonstrates for the first time the ease of tuning the Vth of MoS2 transistors, but also offers a process technology solution that is critical for further development of MoS2 as a mainstream electronic material. PMID:26036230

  7. Unpinned GaAs MOS capacitors and transistors

    NASA Astrophysics Data System (ADS)

    Tiwari, Sandip; Wright, Steven L.; Batey, John

    1988-09-01

    Metal-oxide-semiconductor (MOS) capacitors and field-effect transistors (MOSFETs) in the GaAs semiconductor system using an unpinned interface are described. The structures utilize plasma-enhanced chemical-vapor deposition (PECVD) for the silicon-dioxide insulator on GaAs that has been terminated with a few monolayers of silicon during growth by molecular beam epitaxy. Interface densities in the structures have been reduced to about 10 to the 12th/sq cm-eV. High-frequency characteristics indicate strong inversion of both p-type and n-type GaAs. The excellent insulating quality of the oxide has allowed demonstration of quasi-static characteristics. MOSFETs operating in depletion mode with a transconductance of 60 mS/mm at 8.0-micron gate lengths have been fabricated.

  8. Study of performance scaling of 22-nm epitaxial delta-doped channel MOS transistor

    NASA Astrophysics Data System (ADS)

    Sengupta, Sarmista; Pandit, Soumya

    2015-06-01

    Epitaxial delta-doped channel (EδDC) profile is a promising approach for extending the scalability of bulk metal oxide semiconductor (MOS) technology for low-power system-on-chip applications. A comparative study between EδDC bulk MOS transistor with gate length Lg = 22 nm and a conventional uniformly doped channel (UDC) bulk MOS transistor, with respect to various digital and analogue performances, is presented. The study has been performed using Silvaco technology computer-aided design device simulator, calibrated with experimental results. This study reveals that at smaller gate length, EδDC transistor outperforms the UDC transistor with respect to various studied performances. The reduced contribution of the lateral electric field in the channel plays the key role in this regard. Further, the carrier mobility in EδDC transistor is higher compared to UDC transistor. For moderate gate and drain bias, the impact ionisation rate of the carriers for EδDC MOS transistor is lower than that of the UDC transistor. In addition, at 22 nm, the performances of a EδDC transistor are competitive to that of an ultra-thin body silicon-on-insulator transistor.

  9. Hysteresis in single-layer MoS2 field effect transistors.

    PubMed

    Late, Dattatray J; Liu, Bin; Matte, H S S Ramakrishna; Dravid, Vinayak P; Rao, C N R

    2012-06-26

    Field effect transistors using ultrathin molybdenum disulfide (MoS(2)) have recently been experimentally demonstrated, which show promising potential for advanced electronics. However, large variations like hysteresis, presumably due to extrinsic/environmental effects, are often observed in MoS(2) devices measured under ambient environment. Here, we report the origin of their hysteretic and transient behaviors and suggest that hysteresis of MoS(2) field effect transistors is largely due to absorption of moisture on the surface and intensified by high photosensitivity of MoS(2). Uniform encapsulation of MoS(2) transistor structures with silicon nitride grown by plasma-enhanced chemical vapor deposition is effective in minimizing the hysteresis, while the device mobility is improved by over 1 order of magnitude. PMID:22577885

  10. Thickness-dependent electron mobility of single and few-layer MoS2 thin-film transistors

    NASA Astrophysics Data System (ADS)

    Kim, Ji Heon; Kim, Tae Ho; Lee, Hyunjea; Park, Young Ran; Choi, Woong; Lee, Cheol Jin

    2016-06-01

    We investigated the dependence of electron mobility on the thickness of MoS2 nanosheets by fabricating bottom-gate single and few-layer MoS2 thin-film transistors with SiO2 gate dielectrics and Au electrodes. All the fabricated MoS2 transistors showed on/off-current ratio of ˜107 and saturated output characteristics without high-k capping layers. As the MoS2 thickness increased from 1 to 6 layers, the field-effect mobility of the fabricated MoS2 transistors increased from ˜10 to ˜18 cm2V-1s-1. The increased subthreshold swing of the fabricated transistors with MoS2 thickness suggests that the increase of MoS2 mobility with thickness may be related to the dependence of the contact resistance and the dielectric constant of MoS2 layer on its thickness.

  11. Transferred large area single crystal MoS2 field effect transistors

    NASA Astrophysics Data System (ADS)

    Lee, Choong Hee; McCulloch, William; Lee, Edwin W.; Ma, Lu; Krishnamoorthy, Sriram; Hwang, Jinwoo; Wu, Yiying; Rajan, Siddharth

    2015-11-01

    Transfer of epitaxial, two-dimensional (2D) MoS2 on sapphire grown via synthetic approaches is a prerequisite for practical device applications. We report centimeter-scale, single crystal, synthesized MoS2 field effect transistors (FETs) transferred onto SiO2/Si substrates, with a field-effect mobility of 4.5 cm2 V-1 s-1, which is among the highest mobility values reported for the transferred large-area MoS2 transistors. We demonstrate simple and clean transfer of large-area MoS2 films using deionized water, which can effectively avoid chemical contamination. The transfer method reported here allows standard i-line stepper lithography process to realize multiple devices over the entire film area.

  12. Flexible MoS2 Field-Effect Transistors for Gate-Tunable Piezoresistive Strain Sensors.

    PubMed

    Tsai, Meng-Yen; Tarasov, Alexey; Hesabi, Zohreh R; Taghinejad, Hossein; Campbell, Philip M; Joiner, Corey A; Adibi, Ali; Vogel, Eric M

    2015-06-17

    Atomically thin molybdenum disulfide (MoS2) is a promising two-dimensional semiconductor for high-performance flexible electronics, sensors, transducers, and energy conversion. Here, piezoresistive strain sensing with flexible MoS2 field-effect transistors (FETs) made from highly uniform large-area films is demonstrated. The origin of the piezoresistivity in MoS2 is the strain-induced band gap change, which is confirmed by optical reflection spectroscopy. In addition, the sensitivity to strain can be tuned by more than 1 order of magnitude by adjusting the Fermi level via gate biasing. PMID:26010011

  13. MoS2 Field Effect Transistors with different polarity: study of electrode work functions

    NASA Astrophysics Data System (ADS)

    Dube, Isha; Boyd, Anthony K.; Fontana, Marcio; Gayduchenko, Igor; Fedorov, Georgy; Liu, Amy; Paranjape, Makarand; Barbara, Paola

    2013-03-01

    The transfer characteristics of Molybdenum disulfide (MoS2) field effect transistors (FETs) depend on the Schottky barrier formed between the metal electrode and the semiconducting MoS2. We obtained p-type behavior for Pd-contacted MoS2 FETs and n-type with both Au and Nb contacts. We study the work function of these electrode metals to understand their effect on the Schottky barrier and therefore the polarity of the MoS2 FETs. The work function of the above metals is measured using a non-contact Kelvin Probe technique under different ambient conditions. We will discuss the observed n-type and p-type behavior of MoS2 FETs in relation to the measured metal work functions. Work Funded by NSF, DMR 1008242

  14. Plasma treatment introduced memory properties in MoS2 field-effect transistors

    NASA Astrophysics Data System (ADS)

    Zhang, Miaomiao; Tong, Yanhong; Tang, Qingxin; Liu, Yichun

    2016-01-01

    We present a facile method to obtain MoS2-based nonvolatile memory field-effect transistors by oxygen plasma treatment on the MoS2 surface that is in contact with a dielectric. The oxygen plasma treatment provides a way of introducing deep defects into the MoS2 surface. Only those deep defects located at the semiconductor/dielectric interface can behave as charge trapping sites to develop the memory capability. No memory properties can be observed when the MoS2 surface far from the conductive channel was treated with oxygen plasma. This method brings promising advantages to MoS2-based memory devices obtained using a simple fabrication method and small device dimensions.

  15. High performance MoS2-based field-effect transistor enabled by hydrazine doping

    NASA Astrophysics Data System (ADS)

    Lim, Dongsuk; Kannan, E. S.; Lee, Inyeal; Rathi, Servin; Li, Lijun; Lee, Yoontae; Atif Khan, Muhammad; Kang, Moonshik; Park, Jinwoo; Kim, Gil-Ho

    2016-06-01

    We investigated the n-type doping effect of hydrazine on the electrical characteristics of a molybdenum disulphide (MoS2)-based field-effect transistor (FET). The threshold voltage of the MoS2 FET shifted towards more negative values (from ‑20 to ‑70 V) on treating with 100% hydrazine solution with the channel current increasing from 0.5 to 25 μA at zero gate bias. The inverse subthreshold slope decreased sharply on doping, while the ON/OFF ratio increased by a factor of 100. Gate–channel coupling improved with doping, which facilitates the reduction of channel length between the source and drain electrodes without compromising on the transistor performance, making the MoS2-based FET easily scalable.

  16. High performance MoS2-based field-effect transistor enabled by hydrazine doping.

    PubMed

    Lim, Dongsuk; Kannan, E S; Lee, Inyeal; Rathi, Servin; Li, Lijun; Lee, Yoontae; Khan, Muhammad Atif; Kang, Moonshik; Park, Jinwoo; Kim, Gil-Ho

    2016-06-01

    We investigated the n-type doping effect of hydrazine on the electrical characteristics of a molybdenum disulphide (MoS2)-based field-effect transistor (FET). The threshold voltage of the MoS2 FET shifted towards more negative values (from -20 to -70 V) on treating with 100% hydrazine solution with the channel current increasing from 0.5 to 25 μA at zero gate bias. The inverse subthreshold slope decreased sharply on doping, while the ON/OFF ratio increased by a factor of 100. Gate-channel coupling improved with doping, which facilitates the reduction of channel length between the source and drain electrodes without compromising on the transistor performance, making the MoS2-based FET easily scalable. PMID:27098430

  17. Thickness-dependent mobility in two-dimensional MoS2 transistors

    NASA Astrophysics Data System (ADS)

    Lembke, Dominik; Allain, Adrien; Kis, Andras

    2015-03-01

    Two-dimensional (2D) semiconductors such as mono and few-layer molybdenum disulphide (MoS2) are very promising for integration in future electronics as they represent the ultimate miniaturization limit in the vertical direction. While monolayer MoS2 attracted considerable attention due to its broken inversion symmetry, spin/valley coupling and the presence of a direct band gap, few-layer MoS2 remains a viable option for technological application where its higher mobility and lower contact resistance are believed to offer an advantage. However, it remains unclear whether multilayers are intrinsically superior or if they are less affected by environmental effects. Here, we report the first systematic comparison of the field-effect mobilities in mono-, bi- and trilayer MoS2 transistors after thorough in situ annealing in vacuum. We show that the mobility of field-effect transistors (FETs) based on monolayer MoS2 is significantly higher than that of FETs based on two or three layers. We demonstrate that it is important to remove the influence of gaseous adsorbates and water before comparing mobilities, as monolayers exhibit the highest sensitivity to ambient air exposure. In addition, we study the influence of the substrate roughness and show that this parameter does not affect FET mobilities.Two-dimensional (2D) semiconductors such as mono and few-layer molybdenum disulphide (MoS2) are very promising for integration in future electronics as they represent the ultimate miniaturization limit in the vertical direction. While monolayer MoS2 attracted considerable attention due to its broken inversion symmetry, spin/valley coupling and the presence of a direct band gap, few-layer MoS2 remains a viable option for technological application where its higher mobility and lower contact resistance are believed to offer an advantage. However, it remains unclear whether multilayers are intrinsically superior or if they are less affected by environmental effects. Here, we report

  18. The intrinsic origin of hysteresis in MoS2 field effect transistors

    NASA Astrophysics Data System (ADS)

    Shu, Jiapei; Wu, Gongtao; Guo, Yao; Liu, Bo; Wei, Xianlong; Chen, Qing

    2016-01-01

    We investigate the hysteresis and gate voltage stress effect in MoS2 field effect transistors (FETs). We observe that both the suspended and the SiO2-supported FETs have large hysteresis in their transfer curves under vacuum which cannot be attributed to the traps at the interface between the MoS2 and the SiO2 or in the SiO2 substrate or the gas adsorption/desorption effect. Our findings indicate that the hysteresis we observe comes from the MoS2 itself, revealing an intrinsic origin of the hysteresis besides some extrinsic factors. The fact that the FETs based on thinner MoS2 have larger hysteresis than that with thicker MoS2 suggests that the surface of MoS2 plays a key role in the hysteresis. The gate voltage sweep range, sweep direction, sweep time and loading history all affect the hysteresis observed in the transfer curves.We investigate the hysteresis and gate voltage stress effect in MoS2 field effect transistors (FETs). We observe that both the suspended and the SiO2-supported FETs have large hysteresis in their transfer curves under vacuum which cannot be attributed to the traps at the interface between the MoS2 and the SiO2 or in the SiO2 substrate or the gas adsorption/desorption effect. Our findings indicate that the hysteresis we observe comes from the MoS2 itself, revealing an intrinsic origin of the hysteresis besides some extrinsic factors. The fact that the FETs based on thinner MoS2 have larger hysteresis than that with thicker MoS2 suggests that the surface of MoS2 plays a key role in the hysteresis. The gate voltage sweep range, sweep direction, sweep time and loading history all affect the hysteresis observed in the transfer curves. Electronic supplementary information (ESI) available. See DOI: 10.1039/c5nr07336g

  19. Synthesized multiwall MoS2 nanotube and nanoribbon field-effect transistors

    NASA Astrophysics Data System (ADS)

    Fathipour, S.; Remskar, M.; Varlec, A.; Ajoy, A.; Yan, R.; Vishwanath, S.; Rouvimov, S.; Hwang, W. S.; Xing, H. G.; Jena, D.; Seabaugh, A.

    2015-01-01

    We report on the fabrication and characterization of synthesized multiwall MoS2 nanotube (NT) and nanoribbon (NR) field-effect transistors (FETs). The MoS2 NTs and NRs were grown by chemical transport, using iodine as a transport agent. Raman spectroscopy confirms the material as unambiguously MoS2 in NT, NR, and flake forms. Transmission electron microscopy was used to observe cross sections of the devices after electrical measurements and these were used in the interpretation of the electrical measurements, allowing the estimation of the current density. The NT and NR FETs demonstrate n-type behavior, with ON/OFF current ratios exceeding 103, and with current densities of 1.02 μA/μm and 0.79 μA/μm at VDS = 0.3 V and VBG = 1 V, respectively. Photocurrent measurements conducted on a MoS2 NT FET revealed short-circuit photocurrent of tens of nanoamps under an excitation optical power of 78 μW and 488 nm wavelength, which corresponds to a responsivity of 460 μA/W. A long channel transistor model was used to model the common-source characteristics of MoS2 NT and NR FETs and was shown to be consistent with the measured data.

  20. The intrinsic origin of hysteresis in MoS2 field effect transistors.

    PubMed

    Shu, Jiapei; Wu, Gongtao; Guo, Yao; Liu, Bo; Wei, Xianlong; Chen, Qing

    2016-02-01

    We investigate the hysteresis and gate voltage stress effect in MoS2 field effect transistors (FETs). We observe that both the suspended and the SiO2-supported FETs have large hysteresis in their transfer curves under vacuum which cannot be attributed to the traps at the interface between the MoS2 and the SiO2 or in the SiO2 substrate or the gas adsorption/desorption effect. Our findings indicate that the hysteresis we observe comes from the MoS2 itself, revealing an intrinsic origin of the hysteresis besides some extrinsic factors. The fact that the FETs based on thinner MoS2 have larger hysteresis than that with thicker MoS2 suggests that the surface of MoS2 plays a key role in the hysteresis. The gate voltage sweep range, sweep direction, sweep time and loading history all affect the hysteresis observed in the transfer curves. PMID:26782750

  1. Proposed planar-type amorphous-silicon MOS transistors

    NASA Astrophysics Data System (ADS)

    Uchida, Y.; Matsumura, M.

    1985-10-01

    Novel planar-type amorphous-silicon metal-oxide-semiconductor transistors have been proposed and their features have been demonstrated. The gate insulator of silicon-dioxide grown inside the original amorphous silicon layer makes transistor characteristics highly stable. The source and drain of micro-crystal silicon make the fabrication process simple and the parasitic elements small. The on-current of the prototype transistor was extrapolated to decrease to one-half of its initial value 10 billion years after the application of dc bias. The on-off current ratio was about a million and no voltage offset was observed. The field-effect mobility was 0.6 sq cm Vs.

  2. P-Type Polar Transition of Chemically Doped Multilayer MoS2 Transistor.

    PubMed

    Liu, Xiaochi; Qu, Deshun; Ryu, Jungjin; Ahmed, Faisal; Yang, Zheng; Lee, Daeyeong; Yoo, Won Jong

    2016-03-01

    A high-performance multilayer MoS2 p-type field-effect transistor is realized via controllable chemical doping, which shows an excellent on/off ratio of 10(9) and a maximum hole mobility of 132 cm(2) V(-1) s(-1) at 133 K. The developed technique will enable 2D materials to be used for future high-efficiency and low-power semiconductor device applications. PMID:26808483

  3. Coulomb blockade in monolayer MoS2 single electron transistor.

    PubMed

    Lee, Kyunghoon; Kulkarni, Girish; Zhong, Zhaohui

    2016-03-31

    Substantial effort has been dedicated to understand the intrinsic electronic properties of molybdenum disulfide (MoS2). However, electron transport study on monolayer MoS2 has been challenging to date, especially at low temperatures due to large metal/semiconductor junction barriers. Herein, we report the fabrication and characterization of the monolayer MoS2 single-electron transistor. High performance devices are obtained through the use of low work function metal (zinc) contact and a rapid thermal annealing step. Coulomb blockade is observed at low temperatures and is attributed to single-electron tunneling via two tunnel junction barriers. The nature of Coulomb blockade is also investigated by temperature-dependent conductance oscillation measurement. Our results hold promise for the study of novel quantum transport phenomena in 2D semiconducting atomic layer crystals. PMID:27001412

  4. High performance and transparent multilayer MoS2 transistors: Tuning Schottky barrier characteristics

    NASA Astrophysics Data System (ADS)

    Hong, Young Ki; Yoo, Geonwook; Kwon, Junyeon; Hong, Seongin; Song, Won Geun; Liu, Na; Omkaram, Inturu; Yoo, Byungwook; Ju, Sanghyun; Kim, Sunkook; Oh, Min Suk

    2016-05-01

    Various strategies and mechanisms have been suggested for investigating a Schottky contact behavior in molybdenum disulfide (MoS2) thin-film transistor (TFT), which are still in much debate and controversy. As one of promising breakthrough for transparent electronics with a high device performance, we have realized MoS2 TFTs with source/drain electrodes consisting of transparent bi-layers of a conducting oxide over a thin film of low work function metal. Intercalation of a low work function metal layer, such as aluminum, between MoS2 and transparent source/drain electrodes makes it possible to optimize the Schottky contact characteristics, resulting in about 24-fold and 3 orders of magnitude enhancement of the field-effect mobility and on-off current ratio, respectively, as well as transmittance of 87.4 % in the visible wavelength range.

  5. Polarity control in MoS2 and MoSe2 field effect transistors

    NASA Astrophysics Data System (ADS)

    Fragapane, A.; Bobek, S.; Barroso, D.; Nguyen, A.; Bonilla, E.; Naghibi, S.; von Son Palacio, G.; Klee, V.; Preciado, E.; Martinez, J.; Pleskot, D.; Mann, J.; Shidpoor, R.; Bartels, L.; Sorger, V.; Liu, A.; Paranjape, M.; Barbara, P.

    2014-03-01

    Ambipolar operation is essential for a variety of optoelectronic applications, where both electron and hole transport are required simultaneously. However, hole transport and p-type Schottky barriers have been difficult to achieve in all-solid state field effect transistors based on MoS2 charge channels. In prior work we demonstrated that Schottky barriers of either polarity (p-type or n-type) can be obtained with multilayer MoS2 flakes exfoliated from geological crystals. Here we study Schottky barrier polarity in thinner flakes of MoS2 and MoSe2 (down to single-layer thicknesses) that are grown by CVD, towards understanding how both variations in the bandgap and material work functions affect band alignment at the interface between the flakes and the metal contacts. Supported by the NSF, DMR-1008242, 1106210 and C-SPIN.

  6. Atomistic full-band simulations of monolayer MoS2 transistors

    NASA Astrophysics Data System (ADS)

    Chang, Jiwon; Register, Leonard F.; Banerjee, Sanjay K.

    2013-11-01

    We study the transport properties of deeply scaled monolayer MoS2 n-channel metal-oxide-semiconductor field effect transistors (MOSFETs), using full-band ballistic quantum transport simulations, with an atomistic tight-binding Hamiltonian obtained from density functional theory. Our simulations suggest that monolayer MoS2 MOSFETs can provide near-ideal subthreshold slope, suppression of drain-induced barrier lowering, and gate-induced drain leakage. However, these full-band simulations exhibit limited transconductance. These ballistic simulations also exhibit negative differential resistance (NDR) in the output characteristics associated with the narrow width in energy of the lowest conduction band, but this NDR may be substantially reduced or eliminated by scattering in MoS2.

  7. Highly flexible and transparent multilayer MoS2 transistors with graphene electrodes.

    PubMed

    Yoon, Jongwon; Park, Woojin; Bae, Ga-Yeong; Kim, Yonghun; Jang, Hun Soo; Hyun, Yujun; Lim, Sung Kwan; Kahng, Yung Ho; Hong, Woong-Ki; Lee, Byoung Hun; Ko, Heung Cho

    2013-10-11

    A highly flexible and transparent transistor is developed based on an exfoliated MoS2 channel and CVD-grown graphene source/drain electrodes. Introducing the 2D nanomaterials provides a high mechanical flexibility, optical transmittance (∼74%), and current on/off ratio (>10(4)) with an average field effect mobility of ∼4.7 cm(2) V(-1) s(-1), all of which cannot be achieved by other transistors consisting of a MoS2 active channel/metal electrodes or graphene channel/graphene electrodes. In particular, a low Schottky barrier (∼22 meV) forms at the MoS2 /graphene interface, which is comparable to the MoS2 /metal interface. The high stability in electronic performance of the devices upon bending up to ±2.2 mm in compressive and tensile modes, and the ability to recover electrical properties after degradation upon annealing, reveal the efficacy of using 2D materials for creating highly flexible and transparent devices. PMID:23420782

  8. MoS2 Field-effect Transistors with Graphene/Metal Hetero-contacts

    NASA Astrophysics Data System (ADS)

    Du, Yuchen; Yang, Lingming; Zhang, Jingyun; Conrad, Nathan; Liu, Han; Ye, Peide

    2014-03-01

    MoS2, as one of the mostly studied transition-metal dichalcogenides, has already revealed a series of new physics and potential device applications. However, the performance of the MoS2 field-effect transistors is limited by the large contact resistance at metal/MoS2 interface due to the non-negligible Schottky barrier. In this study, n-type few-layer MoS2 field-effect transistors with graphene/Ti as the metal contacts have been fabricated showing more than 160 mA/mm drain current at 1 μm gate length and on-off current ratio of 107. Different metal contacts (Ti, Ni, Au, and Pd) from low work function to high work function metals on MoS2/graphene hetero contacts have been performed and studied. Moreover, for the first time, 2D Fermi-level pinning concept is introduced to understand the band alignment of hetero-structured metal/graphene/MoS2 or other 2D semiconductor interfaces. Temperature dependent, noise, and stress measurement results will also be presented.

  9. Estimation of temperature impact on gamma-induced degradation parameters of N-channel MOS transistor

    NASA Astrophysics Data System (ADS)

    Jafari, H.; Feghhi, S. A. H.

    2015-03-01

    The physical parameters of MOS transistors can be impressed by ionizing radiation and that leads to circuit degradation and failure. These effects require analyzing the basic mechanism that results in the buildup of induced defect in radiation environments. The reliable estimation also needs to consider external factors, particularly temperature fluctuations. I-V characteristic of the device was obtained using a temperature-dependent adapted form of charge-sheet model under heating cycle during irradiation with several ionizing dose levels at different gate biases. In this work, the analytical calculation for estimating the irradiation temperature impact on gamma-induced degradation parameters of N-channel MOS transistors at different gate biases was investigated. The experimental measurement was done in order to verify and parameterize the analytical model calculations. The results indicated that inserting irradiation temperature in the calculations caused a significant variation in radiation-induced MOS transistor parameters such as threshold voltage shift and off-state leakage current. According to the results, these variations were about 10.1% and 23.4% for voltage shifts and leakage currents respectively during investigated heating cycle for total dose of 20 krad at 9 V gate bias.

  10. Using a floating-gate MOS transistor as a transducer in a MEMS gas sensing system.

    PubMed

    Barranca, Mario Alfredo Reyes; Mendoza-Acevedo, Salvador; Flores-Nava, Luis M; Avila-García, Alejandro; Vazquez-Acosta, E N; Moreno-Cadenas, José Antonio; Casados-Cruz, Gaspar

    2010-01-01

    Floating-gate MOS transistors have been widely used in diverse analog and digital applications. One of these is as a charge sensitive device in sensors for pH measurement in solutions or using gates with metals like Pd or Pt for hydrogen sensing. Efforts are being made to monolithically integrate sensors together with controlling and signal processing electronics using standard technologies. This can be achieved with the demonstrated compatibility between available CMOS technology and MEMS technology. In this paper an in-depth analysis is done regarding the reliability of floating-gate MOS transistors when charge produced by a chemical reaction between metallic oxide thin films with either reducing or oxidizing gases is present. These chemical reactions need temperatures around 200 °C or higher to take place, so thermal insulation of the sensing area must be assured for appropriate operation of the electronics at room temperature. The operation principle of the proposal here presented is confirmed by connecting the gate of a conventional MOS transistor in series with a Fe(2)O(3) layer. It is shown that an electrochemical potential is present on the ferrite layer when reacting with propane. PMID:22163478

  11. Method of making self-aligned lightly-doped-drain structure for MOS transistors

    DOEpatents

    Weiner, Kurt H.; Carey, Paul G.

    2001-01-01

    A process for fabricating lightly-doped-drains (LDD) for short-channel metal oxide semiconductor (MOS) transistors. The process utilizes a pulsed laser process to incorporate the dopants, thus eliminating the prior oxide deposition and etching steps. During the process, the silicon in the source/drain region is melted by the laser energy. Impurities from the gas phase diffuse into the molten silicon to appropriately dope the source/drain regions. By controlling the energy of the laser, a lightly-doped-drain can be formed in one processing step. This is accomplished by first using a single high energy laser pulse to melt the silicon to a significant depth and thus the amount of dopants incorporated into the silicon is small. Furthermore, the dopants incorporated during this step diffuse to the edge of the MOS transistor gate structure. Next, many low energy laser pulses are used to heavily dope the source/drain silicon only in a very shallow region. Because of two-dimensional heat transfer at the MOS transistor gate edge, the low energy pulses are inset from the region initially doped by the high energy pulse. By computer control of the laser energy, the single high energy laser pulse and the subsequent low energy laser pulses are carried out in a single operational step to produce a self-aligned lightly-doped-drain-structure.

  12. Coulomb blockade in monolayer MoS2 single electron transistor

    NASA Astrophysics Data System (ADS)

    Lee, Kyunghoon; Kulkarni, Girish; Zhong, Zhaohui

    2016-03-01

    Substantial effort has been dedicated to understand the intrinsic electronic properties of molybdenum disulfide (MoS2). However, electron transport study on monolayer MoS2 has been challenging to date, especially at low temperatures due to large metal/semiconductor junction barriers. Herein, we report the fabrication and characterization of the monolayer MoS2 single-electron transistor. High performance devices are obtained through the use of low work function metal (zinc) contact and a rapid thermal annealing step. Coulomb blockade is observed at low temperatures and is attributed to single-electron tunneling via two tunnel junction barriers. The nature of Coulomb blockade is also investigated by temperature-dependent conductance oscillation measurement. Our results hold promise for the study of novel quantum transport phenomena in 2D semiconducting atomic layer crystals.Substantial effort has been dedicated to understand the intrinsic electronic properties of molybdenum disulfide (MoS2). However, electron transport study on monolayer MoS2 has been challenging to date, especially at low temperatures due to large metal/semiconductor junction barriers. Herein, we report the fabrication and characterization of the monolayer MoS2 single-electron transistor. High performance devices are obtained through the use of low work function metal (zinc) contact and a rapid thermal annealing step. Coulomb blockade is observed at low temperatures and is attributed to single-electron tunneling via two tunnel junction barriers. The nature of Coulomb blockade is also investigated by temperature-dependent conductance oscillation measurement. Our results hold promise for the study of novel quantum transport phenomena in 2D semiconducting atomic layer crystals. Electronic supplementary information (ESI) available. See DOI: 10.1039/c5nr08954a

  13. Negative Differential Transconductance in a MoS2 /WSe2 Heterojunction Field Effect Transistor

    NASA Astrophysics Data System (ADS)

    Zubair, Ahmad; Nourbakhsh, Amirhasan; Dresselhaus, Mildred; de Gendt, Stefan; Palacios, Tomas

    2015-03-01

    In this work, we demonstrate the negative transconductance in heterojunction transistors made of two-dimensional materials for the first time. Negative transconductance plays a key role in multi-valued logic/memory and frequency multiplication circuits. The simpler fabrication method of stacked van der Waals heterostructures compared to the conventional bulk semiconductors and large area CVD growth of the layered 2D materials systems makes it a prime candidate for scalable novel applications of their heterostructures. Vertically stacked MoS2/WSe2 heterostructures are fabricated by mechanical exfoliation and an in-house dry transfer process. A two-step process of e-beam lithography and metal deposition (Au on MoS2, and Pd on WSe2) were performed to fabricate n-type MoS2 and ambipolar WSe2 FET. The transfer characteristics on the non-overlapping regions shows the expected characteristics of the n-type, MoS2 FET and ambipolar WSe2 FET. At the same time, the transfer characteristics of the overlapping region between MoS2 and WSe2 show negative differential transconductance. With proper scaling and careful optimization this negative differential transconductance will lead to novel applications.

  14. Radio Frequency Transistors and Circuits Based on CVD MoS2.

    PubMed

    Sanne, Atresh; Ghosh, Rudresh; Rai, Amritesh; Yogeesh, Maruthi Nagavalli; Shin, Seung Heon; Sharma, Ankit; Jarvis, Karalee; Mathew, Leo; Rao, Rajesh; Akinwande, Deji; Banerjee, Sanjay

    2015-08-12

    We report on the gigahertz radio frequency (RF) performance of chemical vapor deposited (CVD) monolayer MoS2 field-effect transistors (FETs). Initial DC characterizations of fabricated MoS2 FETs yielded current densities exceeding 200 μA/μm and maximum transconductance of 38 μS/μm. A contact resistance corrected low-field mobility of 55 cm(2)/(V s) was achieved. Radio frequency FETs were fabricated in the ground-signal-ground (GSG) layout, and standard de-embedding techniques were applied. Operating at the peak transconductance, we obtain short-circuit current-gain intrinsic cutoff frequency, fT, of 6.7 GHz and maximum intrinsic oscillation frequency, fmax, of 5.3 GHz for a device with a gate length of 250 nm. The MoS2 device afforded an extrinsic voltage gain Av of 6 dB at 100 MHz with voltage amplification until 3 GHz. With the as-measured frequency performance of CVD MoS2, we provide the first demonstration of a common-source (CS) amplifier with voltage gain of 14 dB and an active frequency mixer with conversion gain of -15 dB. Our results of gigahertz frequency performance as well as analog circuit operation show that large area CVD MoS2 may be suitable for industrial-scale electronic applications. PMID:26134588

  15. Electrical control of the valley Hall effect in bilayer MoS2 transistors

    NASA Astrophysics Data System (ADS)

    Lee, Jieun; Mak, Kin Fai; Shan, Jie

    2016-05-01

    The valley degree of freedom of electrons in solids has been proposed as a new type of information carrier, beyond the electron charge and spin. The potential of two-dimensional semiconductor transition metal dichalcogenides in valley-based electronic and optoelectronic applications has recently been illustrated through experimental demonstrations of the optical orientation of the valley polarization and of the valley Hall effect in monolayer MoS2. However, the valley Hall conductivity in monolayer MoS2, a non-centrosymmetric crystal, cannot be easily tuned, which presents a challenge for the development of valley-based applications. Here, we show that the valley Hall effect in bilayer MoS2 transistors can be controlled with a gate voltage. The gate applies an electric field perpendicular to the plane of the material, breaking the inversion symmetry present in bilayer MoS2. The valley polarization induced by the longitudinal electrical current was imaged with Kerr rotation microscopy. The polarization was found to be present only near the edges of the device channel with opposite sign for the two edges, and was out-of-plane and strongly dependent on the gate voltage. Our observations are consistent with symmetry-dependent Berry curvature and valley Hall conductivity in bilayer MoS2.

  16. Electrical control of the valley Hall effect in bilayer MoS2 transistors.

    PubMed

    Lee, Jieun; Mak, Kin Fai; Shan, Jie

    2016-05-01

    The valley degree of freedom of electrons in solids has been proposed as a new type of information carrier, beyond the electron charge and spin. The potential of two-dimensional semiconductor transition metal dichalcogenides in valley-based electronic and optoelectronic applications has recently been illustrated through experimental demonstrations of the optical orientation of the valley polarization and of the valley Hall effect in monolayer MoS2. However, the valley Hall conductivity in monolayer MoS2, a non-centrosymmetric crystal, cannot be easily tuned, which presents a challenge for the development of valley-based applications. Here, we show that the valley Hall effect in bilayer MoS2 transistors can be controlled with a gate voltage. The gate applies an electric field perpendicular to the plane of the material, breaking the inversion symmetry present in bilayer MoS2. The valley polarization induced by the longitudinal electrical current was imaged with Kerr rotation microscopy. The polarization was found to be present only near the edges of the device channel with opposite sign for the two edges, and was out-of-plane and strongly dependent on the gate voltage. Our observations are consistent with symmetry-dependent Berry curvature and valley Hall conductivity in bilayer MoS2. PMID:26809056

  17. Evaluation of pulsed laser annealing for flexible multilayer MoS2 transistors

    NASA Astrophysics Data System (ADS)

    Kwon, Hyuk-Jun; Kim, Sunkook; Jang, Jaewon; Grigoropoulos, Costas P.

    2015-03-01

    To realize the proper electrical characteristics of field-effect transistors, the quality of the contact and interface must be improved because they can substantially distort the extracted mobility, especially for materials with low densities of states like molybdenum disulfide (MoS2). We show that mechanically flexible MoS2 thin-film transistors (TFTs) with selectively laser annealed source/drain electrodes achieve enhanced device performance without plastic deformation including higher field-effect mobility (from 19.59 to 45.91 cm2 V-1 s-1) in the linear regime, decreased subthreshold swing, and enhanced current saturation. Furthermore, numerical thermal simulations, measured current-voltage characteristics, and contact-free mobility extracted from the Y-function method suggest that the enhanced performance originated from a decrease in the Schottky barrier effect at the contact and an improvement of the channel interface. These results demonstrate that picosecond laser annealing can be a promising technology for building high performance flexible MoS2 TFTs in flexible/stretchable circuitry, which should be processed at low temperatures.

  18. The effect of heavy metal contamination in SIMOX on radiation hardness of MOS transistors

    NASA Astrophysics Data System (ADS)

    Ipri, Alfred C.; Jastrzebski, L.; Peters, D.

    1989-12-01

    It is shown that heavy-metal contamination introduced during implantation of oxygen into silicon results in a reduction of SIMOX (separation by implanted oxygen) oxide radiation hardness. Radiation-induced back-channel leakage currents in MOS transistors processed in SIMOX films containing various levels of heavy metals, as measured by surface photovoltage (SPV), are a strong function of heavy metal concentration. It is concluded that SPV measurements of as-implanted SIMOX wafers can be used as a rapid nondestructive quality control inspection technique to predict the radiation hardness of the SIMOX oxide prior to processing.

  19. Analysis of gate underlap channel double gate MOS transistor for electrical detection of bio-molecules

    NASA Astrophysics Data System (ADS)

    Ajay; Narang, Rakhi; Saxena, Manoj; Gupta, Mridula

    2015-12-01

    In this paper, an analytical model for gate drain underlap channel Double-Gate Metal-Oxide-Semiconductor Field-Effect Transistor (DG-MOSFET) for label free electrical detection of biomolecules has been proposed. The conformal mapping technique has been used to derive the expressions for surface potential, lateral electric field, energy bands (i.e. conduction and valence band) and threshold voltage (Vth). Subsequently a full drain current model to analyze the sensitivity of the biosensor has been developed. The shift in the threshold voltage and drain current (after the biomolecules interaction with the gate underlap channel region of the MOS transistor) has been used as a sensing metric. All the characteristic trends have been verified through ATLAS (SILVACO) device simulation results.

  20. Schottky barrier contrasts in single and bi-layer graphene contacts for MoS2 field-effect transistors

    NASA Astrophysics Data System (ADS)

    Du, Hyewon; Kim, Taekwang; Shin, Somyeong; Kim, Dahye; Kim, Hakseong; Sung, Ji Ho; Lee, Myoung Jae; Seo, David H.; Lee, Sang Wook; Jo, Moon-Ho; Seo, Sunae

    2015-12-01

    We have investigated single- and bi-layer graphene as source-drain electrodes for n-type MoS2 transistors. Ti-MoS2-graphene heterojunction transistors using both single-layer MoS2 (1M) and 4-layer MoS2 (4M) were fabricated in order to compare graphene electrodes with commonly used Ti electrodes. MoS2-graphene Schottky barrier provided electron injection efficiency up to 130 times higher in the subthreshold regime when compared with MoS2-Ti, which resulted in VDS polarity dependence of device parameters such as threshold voltage (VTH) and subthreshold swing (SS). Comparing single-layer graphene (SG) with bi-layer graphene (BG) in 4M devices, SG electrodes exhibited enhanced device performance with higher on/off ratio and increased field-effect mobility (μFE) due to more sensitive Fermi level shift by gate voltage. Meanwhile, in the strongly accumulated regime, we observed opposing behavior depending on MoS2 thickness for both SG and BG contacts. Differential conductance (σd) of 1M increases with VDS irrespective of VDS polarity, while σd of 4M ceases monotonic growth at positive VDS values transitioning to ohmic-like contact formation. Nevertheless, the low absolute value of σd saturation of the 4M-graphene junction demonstrates that graphene electrode could be unfavorable for high current carrying transistors.

  1. Multiple MoS2 Transistors for Sensing Molecule Interaction Kinetics

    PubMed Central

    Nam, Hongsuk; Oh, Bo-Ram; Chen, Pengyu; Chen, Mikai; Wi, Sungjin; Wan, Wenjie; Kurabayashi, Katsuo; Liang, Xiaogan

    2015-01-01

    Atomically layered transition metal dichalcogenides (TMDCs) exhibit a significant potential to enable next-generation low-cost transistor biosensors that permit single-molecule-level quantification of biomolecules. To realize such potential biosensing capability, device-oriented research is needed for calibrating the sensor responses to enable the quantification of the affinities/kinetics of biomolecule interactions. In this work, we demonstrated MoS2-based transistor biosensors capable of detecting tumor necrosis factor – alpha (TNF-α) with a detection limit as low as 60 fM. Such a detection limit was achieved in both linear and subthreshold regimes of MoS2 transistors. In both regimes, all sets of transistors exhibited consistent calibrated responses with respect to TNF-α concentration, and they resulted in a standard curve, from which the equilibrium constant of the antibody-(TNF-α) pair was extracted to be KD = 369 ± 48 fM. Based on this calibrated sensor model, the time-dependent binding kinetics was also measured and the association/dissociation rates of the antibody-(TNF-α) pair were extracted to be (5.03 ± 0.16) × 108 M−1s−1 and (1.97 ± 0.08) × 10−4 s−1, respectively. This work advanced the critical device physics for leveraging the excellent electronic/structural properties of TMDCs in biosensing applications as well as the research capability in analyzing the biomolecule interactions with fM-level sensitivities. PMID:26014289

  2. Tailoring the electrical properties of MoS2 field effect transistors by depositing Au nanoparticles and alkanethiol molecules.

    PubMed

    Cho, Kyungjune; Jeong, Hyunhak; Kim, Tae-Young; Pak, Jinsu; Kim, Jae-Keun; Choi, Barbara Yuri; Lee, Takhee

    2016-05-11

    We fabricated and characterized MoS2 field effect transistors. First, we measured the electrical properties of MoS2 field effect transistors (FETs) that were made with mechanically exfoliated MoS2 flakes. Then, we deposited Au nanoparticles on the MoS2 channel and measured the electrical properties. We observed whether the source-drain current increased or decreased after the Au particles were deposited. The deposited Au particles either formed an extra current path and increased the current or behaved as charge-withdrawing sites and decreased the current. Next, we deposited alkanethiol molecules on the Au particles to reduce the work function of the Au. Alkanethiol molecules are known to form a self-assembled monolayer on the Au surface, and the electric dipole moment of the molecules causes the work function of the Au to decrease. Au particles can capture electrons from the MoS2 channel due to their high work function. However, the decreased work function of the Au particles subjected to alkanethiol treatment could cause captured electrons to be released from the Au particles to MoS2. Therefore, the current increased after alkanethiol treatment. This study may provide useful methods to utilize surface treatments with particles and molecules to tailor the electrical properties of MoS2-based FETs. PMID:27057642

  3. Tailoring the electrical properties of MoS2 field effect transistors by depositing Au nanoparticles and alkanethiol molecules

    NASA Astrophysics Data System (ADS)

    Cho, Kyungjune; Jeong, Hyunhak; Kim, Tae-Young; Pak, Jinsu; Kim, Jae-Keun; Choi, Barbara Yuri; Lee, Takhee

    2016-05-01

    We fabricated and characterized MoS2 field effect transistors. First, we measured the electrical properties of MoS2 field effect transistors (FETs) that were made with mechanically exfoliated MoS2 flakes. Then, we deposited Au nanoparticles on the MoS2 channel and measured the electrical properties. We observed whether the source-drain current increased or decreased after the Au particles were deposited. The deposited Au particles either formed an extra current path and increased the current or behaved as charge-withdrawing sites and decreased the current. Next, we deposited alkanethiol molecules on the Au particles to reduce the work function of the Au. Alkanethiol molecules are known to form a self-assembled monolayer on the Au surface, and the electric dipole moment of the molecules causes the work function of the Au to decrease. Au particles can capture electrons from the MoS2 channel due to their high work function. However, the decreased work function of the Au particles subjected to alkanethiol treatment could cause captured electrons to be released from the Au particles to MoS2. Therefore, the current increased after alkanethiol treatment. This study may provide useful methods to utilize surface treatments with particles and molecules to tailor the electrical properties of MoS2-based FETs.

  4. Improved Contacts to MoS2Transistors by Ultra-High Vacuum Metal Deposition

    NASA Astrophysics Data System (ADS)

    English, Chris D.; Shine, Gautam; Dorgan, Vincent E.; Saraswat, Krishna C.; Pop, Eric

    2016-06-01

    The scaling of transistors to sub-10 nm dimensions is strongly limited by their contact resistance (Rc). Here we present a systematic study of scaling MoS2 devices and contacts with varying electrode metals and controlled deposition conditions, over a wide range of temperatures (80 to 500 K), carrier densities (10^12 to 10^13 1/cm^2), and contact dimensions (20 to 500 nm). We uncover that Au deposited in ultra-high vacuum (~10^-9 Torr) yields three times lower Rc than under normal conditions, reaching 740 Ohm-um and specific contact resistivity 3x10^-7 Ohm.cm2, stable for over four months. Modeling reveals separate Rc contributions from the Schottky barrier and the series access resistance, providing key insights on how to further improve scaling of MoS2 contacts and transistor dimensions. The contact transfer length is ~35 nm at 300 K, which is verified experimentally using devices with 20 nm contacts and 70 nm contact pitch (CP), equivalent to the "14 nm" technology node.

  5. Improved Contacts to MoS2 Transistors by Ultra-High Vacuum Metal Deposition.

    PubMed

    English, Chris D; Shine, Gautam; Dorgan, Vincent E; Saraswat, Krishna C; Pop, Eric

    2016-06-01

    The scaling of transistors to sub-10 nm dimensions is strongly limited by their contact resistance (RC). Here we present a systematic study of scaling MoS2 devices and contacts with varying electrode metals and controlled deposition conditions, over a wide range of temperatures (80 to 500 K), carrier densities (10(12) to 10(13) cm(-2)), and contact dimensions (20 to 500 nm). We uncover that Au deposited in ultra-high vacuum (∼10(-9) Torr) yields three times lower RC than under normal conditions, reaching 740 Ω·μm and specific contact resistivity 3 × 10(-7) Ω·cm(2), stable for over four months. Modeling reveals separate RC contributions from the Schottky barrier and the series access resistance, providing key insights on how to further improve scaling of MoS2 contacts and transistor dimensions. The contact transfer length is ∼35 nm at 300 K, which is verified experimentally using devices with 20 nm contacts and 70 nm contact pitch (CP), equivalent to the "14 nm" technology node. PMID:27232636

  6. Uncovering edge states and electrical inhomogeneity in MoS2 field-effect transistors.

    PubMed

    Wu, Di; Li, Xiao; Luan, Lan; Wu, Xiaoyu; Li, Wei; Yogeesh, Maruthi N; Ghosh, Rudresh; Chu, Zhaodong; Akinwande, Deji; Niu, Qian; Lai, Keji

    2016-08-01

    The understanding of various types of disorders in atomically thin transition metal dichalcogenides (TMDs), including dangling bonds at the edges, chalcogen deficiencies in the bulk, and charges in the substrate, is of fundamental importance for TMD applications in electronics and photonics. Because of the imperfections, electrons moving on these 2D crystals experience a spatially nonuniform Coulomb environment, whose effect on the charge transport has not been microscopically studied. Here, we report the mesoscopic conductance mapping in monolayer and few-layer MoS2 field-effect transistors by microwave impedance microscopy (MIM). The spatial evolution of the insulator-to-metal transition is clearly resolved. Interestingly, as the transistors are gradually turned on, electrical conduction emerges initially at the edges before appearing in the bulk of MoS2 flakes, which can be explained by our first-principles calculations. The results unambiguously confirm that the contribution of edge states to the channel conductance is significant under the threshold voltage but negligible once the bulk of the TMD device becomes conductive. Strong conductance inhomogeneity, which is associated with the fluctuations of disorder potential in the 2D sheets, is also observed in the MIM images, providing a guideline for future improvement of the device performance. PMID:27444021

  7. Programmable Schottky Junctions Based on Ferroelectric Gated MoS2 Transistors

    NASA Astrophysics Data System (ADS)

    Xiao, Zhiyong; Song, Jingfeng; Drcharme, Stephen; Hong, Xia

    We report a programmable Schottky junction based on MoS2 field effect transistors with a SiO2 back gate and a ferroelectric copolymer poly(vinylidene-fluoride-trifluorethylene) (PVDF) top gate. We fabricated mechanically exfoliated single layer MoS2 flakes into two point devices via e-beam lithography, and deposited on the top of the devices ~20 nm PVDF thin films. The polarization of the PVDF layer is controlled locally by conducting atomic force microscopy. The devices exhibit linear ID-VD characteristics when the ferroelectric gate is uniformly polarized in one direction. We then polarized the gate into two domains with opposite polarization directions, and observed that the ID-VD characteristics of the MoS2 channel can be modulated between linear and rectified behaviors depending on the back gate voltage. The nonlinear ID-VD relation emerges when half of the channel is in the semiconductor phase while the other half is in the metallic phase, and it can be well described by the thermionic emission model with a Schottky barrier of ~0.5 eV. The Schottky junction can be erased by re-write the entire channel in the uniform polarization state. Our study facilitates the development of programmable, multifunctional nanoelectronics based on layered 2D TMDs..

  8. Enhancement of photodetection characteristics of MoS2 field effect transistors using surface treatment with copper phthalocyanine.

    PubMed

    Pak, Jinsu; Jang, Jingon; Cho, Kyungjune; Kim, Tae-Young; Kim, Jae-Keun; Song, Younggul; Hong, Woong-Ki; Min, Misook; Lee, Hyoyoung; Lee, Takhee

    2015-11-28

    Recently, two-dimensional materials such as molybdenum disulfide (MoS2) have been extensively studied as channel materials for field effect transistors (FETs) because MoS2 has outstanding electrical properties such as a low subthreshold swing value, a high on/off ratio, and good carrier mobility. In this study, we characterized the electrical and photo-responsive properties of MoS2 FET when stacking a p-type organic copper phthalocyanine (CuPc) layer on the MoS2 surface. We observed that the threshold voltage of MoS2 FET could be controlled by stacking the CuPc layers due to a charge transfer phenomenon at the interface. Particularly, we demonstrated that CuPc/MoS2 hybrid devices exhibited high performance as a photodetector compared with the pristine MoS2 FETs, caused by more electron-hole pairs separation at the p-n interface. Furthermore, we found the optimized CuPc thickness (∼2 nm) on the MoS2 surface for the best performance as a photodetector with a photoresponsivity of ∼1.98 A W(-1), a detectivity of ∼6.11 × 10(10) Jones, and an external quantum efficiency of ∼12.57%. Our study suggests that the MoS2 vertical hybrid structure with organic material can be promising as efficient photodetecting devices and optoelectronic circuits. PMID:26505460

  9. Enhancement of carrier mobility in MoS2 field effect transistors by a SiO2 protective layer

    NASA Astrophysics Data System (ADS)

    Shao, Peng-Zhi; Zhao, Hai-Ming; Cao, Hui-Wen; Wang, Xue-Feng; Pang, Yu; Li, Yu-Xing; Deng, Ning-Qin; Zhang, Jing; Zhang, Guang-Yu; Yang, Yi; Zhang, Sheng; Ren, Tian-Ling

    2016-05-01

    Molybdenum disulfide is a promising channel material for field effect transistors (FETs). In this paper, monolayer MoS2 grown by chemical vapor deposition (CVD) was used to fabricate top-gate FETs through standard optical lithography. During the fabrication process, charged impurities and interface states are introduced, and the photoresist is not removed cleanly, which both limit the carrier mobility and the source-drain current. We apply a SiO2 protective layer, which is deposited on the surface of MoS2, in order to avoid the MoS2 directly contacting with the photoresist and the ambient environment. Therefore, the contact property between the MoS2 and the electrodes is improved, and the Coulomb scattering caused by the charged impurities and the interface states is reduced. Comparing MoS2 FETs with and without a SiO2 protective layer, the SiO2 protective layer is found to enhance the characteristics of the MoS2 FETs, including transfer and output characteristics. A high mobility of ˜42.3 cm2/V s is achieved, which is very large among the top-gate CVD-grown monolayer MoS2 FETs.

  10. Monolayer MoS2 Bandgap Modulation by Dielectric Environments and Tunable Bandgap Transistors.

    PubMed

    Ryou, Junga; Kim, Yong-Sung; Kc, Santosh; Cho, Kyeongjae

    2016-01-01

    Semiconductors with a moderate bandgap have enabled modern electronic device technology, and the current scaling trends down to nanometer scale have introduced two-dimensional (2D) semiconductors. The bandgap of a semiconductor has been an intrinsic property independent of the environments and determined fundamental semiconductor device characteristics. In contrast to bulk semiconductors, we demonstrate that an atomically thin two-dimensional semiconductor has a bandgap with strong dependence on dielectric environments. Specifically, monolayer MoS2 bandgap is shown to change from 2.8 eV to 1.9 eV by dielectric environment. Utilizing the bandgap modulation property, a tunable bandgap transistor, which can be in general made of a two-dimensional semiconductor, is proposed. PMID:27378032

  11. Monolayer MoS2 Bandgap Modulation by Dielectric Environments and Tunable Bandgap Transistors

    PubMed Central

    Ryou, Junga; Kim, Yong-Sung; KC, Santosh; Cho, Kyeongjae

    2016-01-01

    Semiconductors with a moderate bandgap have enabled modern electronic device technology, and the current scaling trends down to nanometer scale have introduced two-dimensional (2D) semiconductors. The bandgap of a semiconductor has been an intrinsic property independent of the environments and determined fundamental semiconductor device characteristics. In contrast to bulk semiconductors, we demonstrate that an atomically thin two-dimensional semiconductor has a bandgap with strong dependence on dielectric environments. Specifically, monolayer MoS2 bandgap is shown to change from 2.8 eV to 1.9 eV by dielectric environment. Utilizing the bandgap modulation property, a tunable bandgap transistor, which can be in general made of a two-dimensional semiconductor, is proposed. PMID:27378032

  12. Design considerations of a MOS-bipolar Darlington structure: The vertical insulated base transistor (IBT)

    NASA Astrophysics Data System (ADS)

    Godignon, P.; Fernández, J.; Flores, D.; Hidalgo, S.; Rebollo, J.; Millán, J.; Chante, J. P.

    1996-12-01

    The analysis of a vertical insulated base transistor (MOS-bipolar Darlington power device with cellular layout) is discussed. The device operation is investigated in the framework of a schematic representation of the output characteristics and by means of 2D numerical simulation. A new design using a P --diffusion interconnecting the P-type regions is proposed to improve the device breakdown voltage. Several cellular and stripe geometries were implemented with a double metal layer technology. Experiments corroborate the simulation results pointing out that the IBT shows a low on-resistance and fast switching times. For the sake of comparison of their electrical characteristics VDMOS and IGBTs were also fabricated with the same process.

  13. New highly linear tunable transconductor circuits with low number of MOS transistors

    NASA Astrophysics Data System (ADS)

    Yucel, Firat; Yuce, Erkan

    2016-08-01

    In this article, two new highly linear tunable transconductor circuits are proposed. The transconductors employ only six MOS transistors operated in saturation region. The second transconductor is derived from the first one with a slight modification. Transconductance of both transconductors can be tuned by a control voltage. Both of the transconductors do not need any additional bias voltages and currents. Another important feature of the transconductors is their high input and output impedances for cascadability with other circuits. Besides, total harmonic distortions are less than 1.5% for both transconductors. A positive lossless grounded inductor simulator with a grounded capacitor is given as an application example of the transconductors. Simulation and experimental test results are included to show effectiveness of the proposed circuits.

  14. Back-gated Nb-doped MoS2 junctionless field-effect-transistors

    NASA Astrophysics Data System (ADS)

    Mirabelli, Gioele; Schmidt, Michael; Sheehan, Brendan; Cherkaoui, Karim; Monaghan, Scott; Povey, Ian; McCarthy, Melissa; Bell, Alan P.; Nagle, Roger; Crupi, Felice; Hurley, Paul K.; Duffy, Ray

    2016-02-01

    Electrical measurements were carried out to measure the performance and evaluate the characteristics of MoS2 flakes doped with Niobium (Nb). The flakes were obtained by mechanical exfoliation and transferred onto 85 nm thick SiO2 oxide and a highly doped Si handle wafer. Ti/Au (5/45 nm) deposited on top of the flake allowed the realization of a back-gate structure, which was analyzed structurally through Scanning Electron Microscopy (SEM) and Transmission Electron Microscopy (TEM). To best of our knowledge this is the first cross-sectional TEM study of exfoliated Nb-doped MoS2 flakes. In fact to date TEM of transition-metal-dichalcogenide flakes is extremely rare in the literature, considering the recent body of work. The devices were then electrically characterized by temperature dependent Ids versus Vds and Ids versus Vbg curves. The temperature dependency of the device shows a semiconductor behavior and, the doping effect by Nb atoms introduces acceptors in the structure, with a p-type concentration 4.3 × 1019 cm-3 measured by Hall effect. The p-type doping is confirmed by all the electrical measurements, making the structure a junctionless transistor. In addition, other parameters regarding the contact resistance between the top metal and MoS2 are extracted thanks to a simple Transfer Length Method (TLM) structure, showing a promising contact resistivity of 1.05 × 10-7 Ω/cm2 and a sheet resistance of 2.36 × 102 Ω/sq.

  15. Theoretical study on the top- and enclosed-contacted single-layer MoS2 piezotronic transistors

    NASA Astrophysics Data System (ADS)

    Liu, Wei; Zhou, Yongli; Zhang, Aihua; Zhang, Yan; Wang, Zhong Lin

    2016-05-01

    Recently, the piezotronic effect has been observed in two-dimensional single-layer MoS2 materials, which have potential applications in force and pressure triggered or controlled electronic devices, sensors, and human-machine interfaces. However, classical theory faces the difficulty in explaining the mechanism of the piezotronic effect for the top- and enclosed-contacted MoS2 transistors, since the piezoelectric charges are assumed to exist only at the edge of the MoS2 flake that is far from the electronic transport pathway. In the present study, we identify the piezoelectric charges at the MoS2/metal-MoS2 interface by employing both the density functional theory and finite element method simulations. This interface is on the transport pathway of both top- and enclosed-contacted MoS2 transistors, thus it is capable of controlling their transport properties. This study deepens the understanding of piezotronic effect and provides guidance for the design of two-dimensional piezotronic devices.

  16. Growth-substrate induced performance degradation in chemically synthesized monolayer MoS2 field effect transistors

    NASA Astrophysics Data System (ADS)

    Amani, Matin; Chin, Matthew L.; Mazzoni, Alexander L.; Burke, Robert A.; Najmaei, Sina; Ajayan, Pulickel M.; Lou, Jun; Dubey, Madan

    2014-05-01

    We report on the electronic transport properties of single-layer thick chemical vapor deposition (CVD) grown molybdenum disulfide (MoS2) field-effect transistors (FETs) on Si/SiO2 substrates. MoS2 has been extensively investigated for the past two years as a potential semiconductor analogue to graphene. To date, MoS2 samples prepared via mechanical exfoliation have demonstrated field-effect mobility values which are significantly higher than that of CVD-grown MoS2. In this study, we will show that the intrinsic electronic performance of CVD-grown MoS2 is equal or superior to that of exfoliated material and has been possibly masked by a combination of interfacial contamination on the growth substrate and residual tensile strain resulting from the high-temperature growth process. We are able to quantify this strain in the as-grown material using pre- and post-transfer metrology and microscopy of the same crystals. Moreover, temperature-dependent electrical measurements made on as-grown and transferred MoS2 devices following an identical fabrication process demonstrate the improvement in field-effect mobility.

  17. Enhancement of photodetection characteristics of MoS2 field effect transistors using surface treatment with copper phthalocyanine

    NASA Astrophysics Data System (ADS)

    Pak, Jinsu; Jang, Jingon; Cho, Kyungjune; Kim, Tae-Young; Kim, Jae-Keun; Song, Younggul; Hong, Woong-Ki; Min, Misook; Lee, Hyoyoung; Lee, Takhee

    2015-11-01

    Recently, two-dimensional materials such as molybdenum disulfide (MoS2) have been extensively studied as channel materials for field effect transistors (FETs) because MoS2 has outstanding electrical properties such as a low subthreshold swing value, a high on/off ratio, and good carrier mobility. In this study, we characterized the electrical and photo-responsive properties of MoS2 FET when stacking a p-type organic copper phthalocyanine (CuPc) layer on the MoS2 surface. We observed that the threshold voltage of MoS2 FET could be controlled by stacking the CuPc layers due to a charge transfer phenomenon at the interface. Particularly, we demonstrated that CuPc/MoS2 hybrid devices exhibited high performance as a photodetector compared with the pristine MoS2 FETs, caused by more electron-hole pairs separation at the p-n interface. Furthermore, we found the optimized CuPc thickness (~2 nm) on the MoS2 surface for the best performance as a photodetector with a photoresponsivity of ~1.98 A W-1, a detectivity of ~6.11 × 1010 Jones, and an external quantum efficiency of ~12.57%. Our study suggests that the MoS2 vertical hybrid structure with organic material can be promising as efficient photodetecting devices and optoelectronic circuits.Recently, two-dimensional materials such as molybdenum disulfide (MoS2) have been extensively studied as channel materials for field effect transistors (FETs) because MoS2 has outstanding electrical properties such as a low subthreshold swing value, a high on/off ratio, and good carrier mobility. In this study, we characterized the electrical and photo-responsive properties of MoS2 FET when stacking a p-type organic copper phthalocyanine (CuPc) layer on the MoS2 surface. We observed that the threshold voltage of MoS2 FET could be controlled by stacking the CuPc layers due to a charge transfer phenomenon at the interface. Particularly, we demonstrated that CuPc/MoS2 hybrid devices exhibited high performance as a photodetector compared

  18. Electrical characteristics of MoS2 field-effect transistor with ferroelectric vinylidene fluoride-trifluoroethylene copolymer gate structure

    NASA Astrophysics Data System (ADS)

    Kobayashi, Takuhei; Hori, Naoki; Nakajima, Takashi; Kawae, Takeshi

    2016-03-01

    Ferroelectric field-effect transistors (FeFET) based on MoS2 have recently been shown to exhibit considerable potential for use in nano sized non-volatile memory devices. Here, we demonstrated fabrication and characterization of FeFET based on MoS2 channel with vinylidene fluoride (VDF)-trifluoroethylene (TrFE) copolymer as back-gate insulator. In this device, counterclockwise hysteresis behavior was observed in the drain current-gate voltage curve, which is indicative of interaction between MoS2 carrier modulation and ferroelectric polarization switching. Furthermore, our VDF-TrFE/MoS2 FeFET exhibited only n-type behavior, a maximum linear mobility of 625 cm2/V s, a large memory window width of 16 V, and a high on/off current ratio of 8 × 105.

  19. Transport Properties of a MoS2/WSe2 Heterojunction Transistor and Its Potential for Application.

    PubMed

    Nourbakhsh, Amirhasan; Zubair, Ahmad; Dresselhaus, Mildred S; Palacios, Tomás

    2016-02-10

    This paper studies band-to-band tunneling in the transverse and lateral directions of van der Waals MoS2/WSe2 heterojunctions. We observe room-temperature negative differential resistance (NDR) in a heterojunction diode comprised of few-layer WSe2 stacked on multilayer MoS2. The presence of NDR is attributed to the lateral band-to-band tunneling at the edge of the MoS2/WSe2 heterojunction. The backward tunneling diode shows an average conductance slope of 75 mV/dec with a high curvature coefficient of 62 V(-1). Associated with the tunnel-diode characteristics, a positive-to-negative transconductance in the MoS2/WSe2 heterojunction transistors is observed. The transition is induced by strong interlayer coupling between the films, which results in charge density and energy-band modulation. The sign change in transconductance is particularly useful for multivalued logic (MVL) circuits, and we therefore propose and demonstrate for the first time an MVL-inverter that shows three levels of logic using one pair of p-type transistors. PMID:26784325

  20. Non-Faradaic Electrochemical Detection of Exocytosis from Mast and Chromaffin Cells Using Floating-Gate MOS Transistors.

    PubMed

    Jayant, Krishna; Singhai, Amit; Cao, Yingqiu; Phelps, Joshua B; Lindau, Manfred; Holowka, David A; Baird, Barbara A; Kan, Edwin C

    2015-01-01

    We present non-faradaic electrochemical recordings of exocytosis from populations of mast and chromaffin cells using chemoreceptive neuron MOS (CνMOS) transistors. In comparison to previous cell-FET-biosensors, the CνMOS features control (CG), sensing (SG) and floating gates (FG), allows the quiescent point to be independently controlled, is CMOS compatible and physically isolates the transistor channel from the electrolyte for stable long-term recordings. We measured exocytosis from RBL-2H3 mast cells sensitized by IgE (bound to high-affinity surface receptors FcεRI) and stimulated using the antigen DNP-BSA. Quasi-static I-V measurements reflected a slow shift in surface potential () which was dependent on extracellular calcium ([Ca]o) and buffer strength, which suggests sensitivity to protons released during exocytosis. Fluorescent imaging of dextran-labeled vesicle release showed evidence of a similar time course, while un-sensitized cells showed no response to stimulation. Transient recordings revealed fluctuations with a rapid rise and slow decay. Chromaffin cells stimulated with high KCl showed both slow shifts and extracellular action potentials exhibiting biphasic and inverted capacitive waveforms, indicative of varying ion-channel distributions across the cell-transistor junction. Our approach presents a facile method to simultaneously monitor exocytosis and ion channel activity with high temporal sensitivity without the need for redox chemistry. PMID:26686301

  1. Non-Faradaic Electrochemical Detection of Exocytosis from Mast and Chromaffin Cells Using Floating-Gate MOS Transistors

    PubMed Central

    Jayant, Krishna; Singhai, Amit; Cao, Yingqiu; Phelps, Joshua B.; Lindau, Manfred; Holowka, David A.; Baird, Barbara A.; Kan, Edwin C.

    2015-01-01

    We present non-faradaic electrochemical recordings of exocytosis from populations of mast and chromaffin cells using chemoreceptive neuron MOS (CνMOS) transistors. In comparison to previous cell-FET-biosensors, the CνMOS features control (CG), sensing (SG) and floating gates (FG), allows the quiescent point to be independently controlled, is CMOS compatible and physically isolates the transistor channel from the electrolyte for stable long-term recordings. We measured exocytosis from RBL-2H3 mast cells sensitized by IgE (bound to high-affinity surface receptors FcεRI) and stimulated using the antigen DNP-BSA. Quasi-static I-V measurements reflected a slow shift in surface potential () which was dependent on extracellular calcium ([Ca]o) and buffer strength, which suggests sensitivity to protons released during exocytosis. Fluorescent imaging of dextran-labeled vesicle release showed evidence of a similar time course, while un-sensitized cells showed no response to stimulation. Transient recordings revealed fluctuations with a rapid rise and slow decay. Chromaffin cells stimulated with high KCl showed both slow shifts and extracellular action potentials exhibiting biphasic and inverted capacitive waveforms, indicative of varying ion-channel distributions across the cell-transistor junction. Our approach presents a facile method to simultaneously monitor exocytosis and ion channel activity with high temporal sensitivity without the need for redox chemistry. PMID:26686301

  2. Thermally activated trap charges responsible for hysteresis in multilayer MoS2 field-effect transistors

    NASA Astrophysics Data System (ADS)

    Park, Youngseo; Baac, Hyoung Won; Heo, Junseok; Yoo, Geonwook

    2016-02-01

    Hysteresis, which is induced by both extrinsic and intrinsic causes, is often observed in molybdenum disulphide (MoS2) field-effect transistors (FETs), and several extrinsic hysteresis effects have been reported in unpassivated bottom-gate MoS2 device structures. In this study, interface-trap-induced hysteresis and other electrical properties are examined. We experimentally investigate thermally activated trap charges near a silicon-dioxide (SiO2)-MoS2 interface that gives rise to hysteresis in a multilayer MoS2 FET in a temperature region of 10-300 K. The threshold voltage (VTH) and field-effect mobility (μFE) decrease with the increase in temperature, regardless of the gate-bias sweep direction. The hysteresis that coincides with the trend of subthreshold swing increases sharply above T = 150 K as the released charges from interface traps become dominant over the fixed charges. Based on a temperature-dependent hysteresis analysis, we discussed the activation energy of interface traps and maximum interface trap density of the fabricated multilayer MoS2 FET.

  3. Thickness-dependent charge transport in few-layer MoS2 field-effect transistors

    NASA Astrophysics Data System (ADS)

    Lin, Ming-Wei; Kravchenko, Ivan I.; Fowlkes, Jason; Li, Xufan; Puretzky, Alexander A.; Rouleau, Christopher M.; Geohegan, David B.; Xiao, Kai

    2016-04-01

    Molybdenum disulfide (MoS2) is currently under intensive study because of its exceptional optical and electrical properties in few-layer form. However, how charge transport mechanisms vary with the number of layers in MoS2 flakes remains unclear. Here, exfoliated flakes of MoS2 with various thicknesses were successfully fabricated into field-effect transistors (FETs) to measure the thickness and temperature dependences of electrical mobility. For these MoS2 FETs, measurements at both 295 K and 77 K revealed the maximum mobility for layer thicknesses between 5 layers (˜3.6 nm) and 10 layers (˜7 nm), with ˜70 cm2 V-1 s-1 measured for 5 layer devices at 295 K. Temperature-dependent mobility measurements revealed that the mobility rises with increasing temperature to a maximum. This maximum occurs at increasing temperature with increasing layer thickness, possibly due to strong Coulomb scattering from charge impurities or weakened electron-phonon interactions for thicker devices. Temperature-dependent conductivity measurements for different gate voltages revealed a metal-to-insulator transition for devices thinner than 10 layers, which may enable new memory and switching applications. This study advances the understanding of fundamental charge transport mechanisms in few-layer MoS2, and indicates the promise of few-layer transition metal dichalcogenides as candidates for potential optoelectronic applications.

  4. Thickness-dependent charge transport in few-layer MoS2 field-effect transistors.

    PubMed

    Lin, Ming-Wei; Kravchenko, Ivan I; Fowlkes, Jason; Li, Xufan; Puretzky, Alexander A; Rouleau, Christopher M; Geohegan, David B; Xiao, Kai

    2016-04-22

    Molybdenum disulfide (MoS2) is currently under intensive study because of its exceptional optical and electrical properties in few-layer form. However, how charge transport mechanisms vary with the number of layers in MoS2 flakes remains unclear. Here, exfoliated flakes of MoS2 with various thicknesses were successfully fabricated into field-effect transistors (FETs) to measure the thickness and temperature dependences of electrical mobility. For these MoS2 FETs, measurements at both 295 K and 77 K revealed the maximum mobility for layer thicknesses between 5 layers (∼3.6 nm) and 10 layers (∼7 nm), with ∼70 cm(2) V(-1) s(-1) measured for 5 layer devices at 295 K. Temperature-dependent mobility measurements revealed that the mobility rises with increasing temperature to a maximum. This maximum occurs at increasing temperature with increasing layer thickness, possibly due to strong Coulomb scattering from charge impurities or weakened electron-phonon interactions for thicker devices. Temperature-dependent conductivity measurements for different gate voltages revealed a metal-to-insulator transition for devices thinner than 10 layers, which may enable new memory and switching applications. This study advances the understanding of fundamental charge transport mechanisms in few-layer MoS2, and indicates the promise of few-layer transition metal dichalcogenides as candidates for potential optoelectronic applications. PMID:26963583

  5. Multilayer MoS2 prepared by one-time and repeated chemical vapor depositions: anomalous Raman shifts and transistors with high ON/OFF ratio

    NASA Astrophysics Data System (ADS)

    Wu, Chong-Rong; Chang, Xiang-Rui; Chang, Shu-Wei; Chang, Chung-En; Wu, Chao-Hsin; Lin, Shih-Yen

    2015-11-01

    We show that multilayer molybdenum disulfide (MoS2) grown with the chemical vapor deposition (CVD) may exhibit quite distinct behaviors of Raman shifts from those of exfoliated ones. The anomalous Raman shifts depend on CVD growth modes and are attributed to the modified dielectric screening and interlayer coupling of MoS2 in various growth conditions. With repeated CVD growths, we demonstrated the precise control over the layer number of MoS2. A decently large drain current, high ON/OFF ratio of 105, and enhanced field-effect mobility can be achieved in transistors fabricated on the six-layer MoS2.

  6. Enhancement-mode operation of multilayer MoS2 transistors with a fluoropolymer gate dielectric layer

    NASA Astrophysics Data System (ADS)

    Yoo, Geonwook; Choi, Sol Lea; Lee, Suelbe; Yoo, Byungwook; Kim, Sunkook; Oh, Min Suk

    2016-06-01

    Enhancement-mode multilayer molybdenum disulfide (MoS2) field-effect transistors (FETs), which are an immensely important component toward low-power electronics based on a two-dimensional layered semiconductor, are demonstrated using the fluoropolymer CYTOP as a gate dielectric. The fabricated devices exhibit threshold voltage (VTH) of ˜5.7 V with field-effect mobility (μFE) of up to 82.3 cm2/V s, and the characteristics are compared with the depletion-mode characteristics of MoS2 FETs with the cross-linked Poly(4-vinylphenol) gate dielectric (VTH ˜ -7.8 V). UV photoelectron spectroscopy analysis indicates that increased surface potential due to the surface dipole effect of the fluorine group influences the positive VTH shift.

  7. Low voltage and high ON/OFF ratio field-effect transistors based on CVD MoS2 and ultra high-k gate dielectric PZT.

    PubMed

    Zhou, Changjian; Wang, Xinsheng; Raju, Salahuddin; Lin, Ziyuan; Villaroman, Daniel; Huang, Baoling; Chan, Helen Lai-Wa; Chan, Mansun; Chai, Yang

    2015-05-21

    MoS2 and other atomic-level thick layered materials have been shown to have a high potential for outperforming Si transistors at the scaling limit. In this work, we demonstrate a MoS2 transistor with a low voltage and high ON/OFF ratio. A record small equivalent oxide thickness of ∼1.1 nm has been obtained by using ultra high-k gate dielectric Pb(Zr0.52Ti0.48)O3. The low threshold voltage (<0.5 V) is comparable to that of the liquid/gel gated MoS2 transistor. The small sub-threshold swing of 85.9 mV dec(-1), the high ON/OFF ratio of ∼10(8) and the negligible hysteresis ensure a high performance of the MoS2 transistor operating at 1 V. The extracted field-effect mobility of 1-10 cm(2) V(-1) s(-1) suggests a high crystalline quality of the CVD-grown MoS2 flakes. The combination of the two-dimensional layered semiconductor and the ultra high-k dielectric may enable the development of low-power electronic applications. PMID:25907959

  8. Transport properties of unrestricted carriers in bridge-channel MoS2 field-effect transistors

    NASA Astrophysics Data System (ADS)

    Qiu, Dongri; Lee, Dong Uk; Park, Chang Soo; Lee, Kyoung Su; Kim, Eun Kyu

    2015-10-01

    Unsuppressed carrier scattering from the underlying substrate in a layered two-dimensional material system is extensively observed, which degrades significantly the performance of devices. Beyond the material itself, understanding the intrinsic interfacial and surficial properties is an important issue for the analysis of a high-κ/MoS2 heterostructure. Here, we report on the electronic transport properties of bridge-channel MoS2 field-effect transistors fabricated by a contamination-free transfer method. After neglecting all the surrounding perturbations, it is possible to reveal the significant improvement of room-temperature mobility and subthreshold slope. A systematic study on variable-temperature transport measurements has quantified the trap density of states both in free-standing and SiO2-supported MoS2 systems. Compared to the bridge-channel MoS2 devices with an ideal interface, the unsuspended devices have a large amount of band tail states, and then the impact of their electronic states on the device performance is also discussed.Unsuppressed carrier scattering from the underlying substrate in a layered two-dimensional material system is extensively observed, which degrades significantly the performance of devices. Beyond the material itself, understanding the intrinsic interfacial and surficial properties is an important issue for the analysis of a high-κ/MoS2 heterostructure. Here, we report on the electronic transport properties of bridge-channel MoS2 field-effect transistors fabricated by a contamination-free transfer method. After neglecting all the surrounding perturbations, it is possible to reveal the significant improvement of room-temperature mobility and subthreshold slope. A systematic study on variable-temperature transport measurements has quantified the trap density of states both in free-standing and SiO2-supported MoS2 systems. Compared to the bridge-channel MoS2 devices with an ideal interface, the unsuspended devices have a large

  9. The role of charge trapping in MoS2/SiO2 and MoS2/hBN field-effect transistors

    NASA Astrophysics Data System (ADS)

    Illarionov, Yury Yu; Rzepa, Gerhard; Waltl, Michael; Knobloch, Theresia; Grill, Alexander; Furchi, Marco M.; Mueller, Thomas; Grasser, Tibor

    2016-09-01

    The commonly observed hysteresis in the transfer characteristics of MoS2 transistors is typically associated with charge traps in the gate insulator. Since in Si technologies such traps can lead to severe reliability issues, we perform a combined study of both the hysteresis as well as the arguably most important reliability issue, the bias-temperature instability. We use single-layer MoS2 FETs with SiO2 and hBN insulators and demonstrate that both phenomena are indeed due to traps in the gate insulator with time constants distributed over wide timescales, where the faster ones lead to hysteresis and the slower ones to bias-temperature instabilities. Our data show that the use of hBN as a gate insulator considerably reduces the number of accessible slow traps and thus improves the reliability. However, the reliability of hBN insulators deteriorates with increasing temperature due to the thermally activated nature of charge trapping.

  10. Enhancing Photoresponsivity of Self-Aligned MoS2 Field-Effect Transistors by Piezo-Phototronic Effect from GaN Nanowires.

    PubMed

    Liu, Xingqiang; Yang, Xiaonian; Gao, Guoyun; Yang, Zhenyu; Liu, Haitao; Li, Qiang; Lou, Zheng; Shen, Guozhen; Liao, Lei; Pan, Caofeng; Lin Wang, Zhong

    2016-08-23

    We report high-performance self-aligned MoS2 field-effect transistors (FETs) with enhanced photoresponsivity by the piezo-phototronic effect. The FETs are fabricated based on monolayer MoS2 with a piezoelectric GaN nanowire (NW) as the local gate, and a self-aligned process is employed to define the source/drain electrodes. The fabrication method allows the preservation of the intrinsic property of MoS2 and suppresses the scattering center density in the MoS2/GaN interface, which results in high electrical and photoelectric performances. MoS2 FETs with channel lengths of ∼200 nm have been fabricated with a small subthreshold slope of 64 mV/dec. The photoresponsivity is 443.3 A·W(-1), with a fast response and recovery time of ∼5 ms under 550 nm light illumination. When strain is introduced into the GaN NW, the photoresponsivity is further enhanced to 734.5 A·W(-1) and maintains consistent response and recovery time, which is comparable with that of the mechanical exfoliation of MoS2 transistors. The approach presented here opens an avenue to high-performance top-gated piezo-enhanced MoS2 photodetectors. PMID:27447946

  11. Extrinsic Origin of Persistent Photoconductivity in Monolayer MoS2 Field Effect Transistors

    PubMed Central

    Wu, Yueh-Chun; Liu, Cheng-Hua; Chen, Shao-Yu; Shih, Fu-Yu; Ho, Po-Hsun; Chen, Chun-Wei; Liang, Chi-Te; Wang, Wei-Hua

    2015-01-01

    Recent discoveries of the photoresponse of molybdenum disulfide (MoS2) have shown the considerable potential of these two-dimensional transition metal dichalcogenides for optoelectronic applications. Among the various types of photoresponses of MoS2, persistent photoconductivity (PPC) at different levels has been reported. However, a detailed study of the PPC effect and its mechanism in MoS2 is still not available, despite the importance of this effect on the photoresponse of the material. Here, we present a systematic study of the PPC effect in monolayer MoS2 and conclude that the effect can be attributed to random localized potential fluctuations in the devices. Notably, the potential fluctuations originate from extrinsic sources based on the substrate effect of the PPC. Moreover, we point out a correlation between the PPC effect in MoS2 and the percolation transport behavior of MoS2. We demonstrate a unique and efficient means of controlling the PPC effect in monolayer MoS2, which may offer novel functionalities for MoS2-based optoelectronic applications in the future. PMID:26112341

  12. Extrinsic Origin of Persistent Photoconductivity in Monolayer MoS2 Field Effect Transistors

    NASA Astrophysics Data System (ADS)

    Wu, Yueh-Chun; Liu, Cheng-Hua; Chen, Shao-Yu; Shih, Fu-Yu; Ho, Po-Hsun; Chen, Chun-Wei; Liang, Chi-Te; Wang, Wei-Hua

    2015-06-01

    Recent discoveries of the photoresponse of molybdenum disulfide (MoS2) have shown the considerable potential of these two-dimensional transition metal dichalcogenides for optoelectronic applications. Among the various types of photoresponses of MoS2, persistent photoconductivity (PPC) at different levels has been reported. However, a detailed study of the PPC effect and its mechanism in MoS2 is still not available, despite the importance of this effect on the photoresponse of the material. Here, we present a systematic study of the PPC effect in monolayer MoS2 and conclude that the effect can be attributed to random localized potential fluctuations in the devices. Notably, the potential fluctuations originate from extrinsic sources based on the substrate effect of the PPC. Moreover, we point out a correlation between the PPC effect in MoS2 and the percolation transport behavior of MoS2. We demonstrate a unique and efficient means of controlling the PPC effect in monolayer MoS2, which may offer novel functionalities for MoS2-based optoelectronic applications in the future.

  13. High-performance, highly bendable MoS2 transistors with high-k dielectrics for flexible low-power systems.

    PubMed

    Chang, Hsiao-Yu; Yang, Shixuan; Lee, Jongho; Tao, Li; Hwang, Wan-Sik; Jena, Debdeep; Lu, Nanshu; Akinwande, Deji

    2013-06-25

    While there has been increasing studies of MoS2 and other two-dimensional (2D) semiconducting dichalcogenides on hard conventional substrates, experimental or analytical studies on flexible substrates has been very limited so far, even though these 2D crystals are understood to have greater prospects for flexible smart systems. In this article, we report detailed studies of MoS2 transistors on industrial plastic sheets. Transistor characteristics afford more than 100x improvement in the ON/OFF current ratio and 4x enhancement in mobility compared to previous flexible MoS2 devices. Mechanical studies reveal robust electronic properties down to a bending radius of 1 mm which is comparable to previous reports for flexible graphene transistors. Experimental investigation identifies that crack formation in the dielectric is the responsible failure mechanism demonstrating that the mechanical properties of the dielectric layer is critical for realizing flexible electronics that can accommodate high strain. Our uniaxial tensile tests have revealed that atomic-layer-deposited HfO2 and Al2O3 films have very similar crack onset strain. However, crack propagation is slower in HfO2 dielectric compared to Al2O3 dielectric, suggesting a subcritical fracture mechanism in the thin oxide films. Rigorous mechanics modeling provides guidance for achieving flexible MoS2 transistors that are reliable at sub-mm bending radius. PMID:23668386

  14. Nanoimprint-Assisted Shear Exfoliation (NASE) for Producing Multilayer MoS2 Structures as Field-Effect Transistor Channel Arrays.

    PubMed

    Chen, Mikai; Nam, Hongsuk; Rokni, Hossein; Wi, Sungjin; Yoon, Jeong Seop; Chen, Pengyu; Kurabayashi, Katsuo; Lu, Wei; Liang, Xiaogan

    2015-09-22

    MoS2 and other semiconducting transition metal dichalcogenides (TMDCs) are of great interest due to their excellent physical properties and versatile chemistry. Although many recent research efforts have been directed to explore attractive properties associated with MoS2 monolayers, multilayer/few-layer MoS2 structures are indeed demanded by many practical scale-up device applications, because multilayer structures can provide sizable electronic/photonic state densities for driving upscalable electrical/optical signals. Currently there is a lack of processes capable of producing ordered, pristine multilayer structures of MoS2 (or other relevant TMDCs) with manufacturing-grade uniformity of thicknesses and electronic/photonic properties. In this article, we present a nanoimprint-based approach toward addressing this challenge. In this approach, termed as nanoimprint-assisted shear exfoliation (NASE), a prepatterned bulk MoS2 stamp is pressed into a polymeric fixing layer, and the imprinted MoS2 features are exfoliated along a shear direction. This shear exfoliation can significantly enhance the exfoliation efficiency and thickness uniformity of exfoliated flakes in comparison with previously reported exfoliation processes. Furthermore, we have preliminarily demonstrated the fabrication of multiple transistors and biosensors exhibiting excellent device-to-device performance consistency. Finally, we present a molecular dynamics modeling analysis of the scaling behavior of NASE. This work holds significant potential to leverage the superior properties of MoS2 and other emerging TMDCs for practical scale-up device applications. PMID:26302003

  15. Method of making V-MOS field effect transistors utilizing a two-step anisotropic etching and ion implantation

    NASA Technical Reports Server (NTRS)

    Jhabvala, M. D. (Inventor)

    1981-01-01

    A method of making V-MOS field effect transistors is disclosed wherein a masking layer is first formed over a surface of a crystalline substrate. An aperture is then formed in the masking layer to expose the surface of the substrate. An anisotropic etchant is applied to the exposed surface so that a groove having a decreasing width within increasing depth is formed. However, the etch is not allowed to go to completion with the result that a partially formed V-shaped groove is formed. Ions are accelerated through the aperture for implantation in the crystalline substrate in the lower portion of the partially formed V-shaped groove. Thereafter, an anisotropic etchant is reapplied to the partially formed V-shaped groove, and the etch is allowed to go to completion.

  16. A Commercial off-the-shelf pMOS Transistor as X-ray and Heavy Ion Detector

    NASA Astrophysics Data System (ADS)

    Silveira, M. A. G.; Melo, M. A. A.; Aguiar, V. A. P.; Rallo, A.; Santos, R. B. B.; Medina, N. H.; Added, N.; Seixas, L. E., Jr.; Leite, F. G.; Cunha, F. G.; Cirne, K. H.; Giacomini, R.; de Oliveira, J. A.

    2015-07-01

    Recently, p-channel metal-oxide-semiconductor (pMOS) transistors were suggested as fit for the task of detecting and quantifying ionizing radiation dose. Linearity, small detection volume, fast readout, portability, low power consumption and low radiation attenuation are some of the pMOS advantages over PIN diode and thermoluminiscent dosimeters. A hand-held measurement system using a low power commercial off-the-shelf pMOSas the sensor would have a clear advantage due to the lower cost incurred by a standard technological process. In this research work, we tested the commercial device 3N163 regarding its behaviouras an X-ray sensor, as well as its possible application as a heavy-ion detector. To study the radiation effects of X-rays, a XRD-7000 (Shimadzu) X-ray diffraction setup was used to produce 10-keV effective energy photons. Heavy ions tests involved 12C, 16O, 19F, 28Si, 35Cl, 63Cu and 107Ag beams scattered at 15° by a 275 μg/cm2 gold target, which provide LETs (Linear Energy Transfer) from 4 to 40 MeV/mg/cm2. The signal readout was done using a 1 GHz oscilloscope with a 10-Gsamples/s conversion rate, high enough to permit the recording of transient pulses in the drain current. In this case, an ion can cause a current signal proportional to the ion beam used. Through this study it was found that a simple commercial pMOS device can be reliably used as a detector of X-rays as well as heavy ion detector.

  17. Integration of High-k Oxide on MoS2 by Using Ozone Pretreatment for High-Performance MoS2 Top-Gated Transistor with Thickness-Dependent Carrier Scattering Investigation.

    PubMed

    Wang, Jingli; Li, Songlin; Zou, Xuming; Ho, Johnny; Liao, Lei; Xiao, Xiangheng; Jiang, Changzhong; Hu, Weida; Wang, Jianlu; Li, Jinchai

    2015-11-25

    A top-gated MoS2 transistor with 6 nm thick HfO2 is fabricated using an ozone pretreatment. The influence to the top-gated mobility brought about by the deposition of HfO2 is studied statistically, for the first time. The top-gated mobility is suppressed by the deposition of HfO2 , and multilayered samples are less susceptible than monolayer ones. PMID:26426344

  18. Trap density probing on top-gate MoS2 nanosheet field-effect transistors by photo-excited charge collection spectroscopy

    NASA Astrophysics Data System (ADS)

    Choi, Kyunghee; Raza, Syed Raza Ali; Lee, Hee Sung; Jeon, Pyo Jin; Pezeshki, Atiye; Min, Sung-Wook; Kim, Jin Sung; Yoon, Woojin; Ju, Sang-Yong; Lee, Kimoon; Im, Seongil

    2015-03-01

    Two-dimensional (2D) molybdenum disulfide (MoS2) field-effect transistors (FETs) have been extensively studied, but most of the FETs with gate insulators have displayed negative threshold voltage values, which indicates the presence of interfacial traps both shallow and deep in energy level. Despite such interface trap issues, reports on trap densities in MoS2 are quite limited. Here, we probed top-gate MoS2 FETs with two- (2L), three- (3L), and four-layer (4L) MoS2/dielectric interfaces to quantify deep-level interface trap densities by photo-excited charge collection spectroscopy (PECCS), and reported the result that deep-level trap densities over 1012 cm-2 may exist in the interface and bulk MoS2 near the interface. Transfer curve hysteresis and PECCS measurements show that shallow traps and deep traps are not that different in density order from each other. We conclude that our PECCS analysis distinguishably provides valuable information on deep level interface/bulk trap densities in 2D-based FETs.Two-dimensional (2D) molybdenum disulfide (MoS2) field-effect transistors (FETs) have been extensively studied, but most of the FETs with gate insulators have displayed negative threshold voltage values, which indicates the presence of interfacial traps both shallow and deep in energy level. Despite such interface trap issues, reports on trap densities in MoS2 are quite limited. Here, we probed top-gate MoS2 FETs with two- (2L), three- (3L), and four-layer (4L) MoS2/dielectric interfaces to quantify deep-level interface trap densities by photo-excited charge collection spectroscopy (PECCS), and reported the result that deep-level trap densities over 1012 cm-2 may exist in the interface and bulk MoS2 near the interface. Transfer curve hysteresis and PECCS measurements show that shallow traps and deep traps are not that different in density order from each other. We conclude that our PECCS analysis distinguishably provides valuable information on deep level interface

  19. THE SILICON OLFACTORY BULB: A NEUROMORPHIC APPROACH TO MOLECULAR SENSING WITH CHEMORECEPTIVE NEURON MOS TRANSISTORS (CNMOS)

    EPA Science Inventory

    Within the 3 -year effort, we have established several major findings:

    • Chemical sensor in fluid environment with inorganic and polymer sensing surfaces (1,5): Conventional metal oxide semiconductor field effect transistor (MOSFET)-based chemical sensing su...

    • Lifetime studies of 130nm nMOS transistors intended for long-duration, cryogenic high-energy physics experiments.

      SciTech Connect

      Hoff, J.R.; Arora, R.; Cressler, J.D.; Deptuch, G.W.; Gui, P.; Lourenco, N.E.; Wu, G.; Yarema, R.J.; /Fermilab

      2011-12-01

      Future neutrino physics experiments intend to use unprecedented volumes of liquid argon to fill a time projection chamber in an underground facility. To increase performance, integrated readout electronics should work inside the cryostat. Due to the scale and cost associated with evacuating and filling the cryostat, the electronics will be unserviceable for the duration of the experiment. Therefore, the lifetimes of these circuits must be well in excess of 20 years. The principle mechanism for lifetime degradation of MOSFET devices and circuits operating at cryogenic temperatures is via hot carrier degradation. Choosing a process technology that is, as much as possible, immune to such degradation and developing design techniques to avoid exposure to such damage are the goals. This requires careful investigation and a basic understanding of the mechanisms that underlie hot carrier degradation and the secondary effects they cause in circuits. In this work, commercially available 130nm nMOS transistors operating at cryogenic temperatures are investigated. The results show that the difference in lifetime for room temperature operation and cryogenic operation for this process are not great and the lifetimes at both 300K and at 77K can be projected to more than 20 years at the nominal voltage (1.5V) for this technology.

  1. Metal Semiconductor Field-Effect Transistor with MoS2/Conducting NiO(x) van der Waals Schottky Interface for Intrinsic High Mobility and Photoswitching Speed.

    PubMed

    Lee, Hee Sung; Baik, Seung Su; Lee, Kimoon; Min, Sung-Wook; Jeon, Pyo Jin; Kim, Jin Sung; Choi, Kyujin; Choi, Hyoung Joon; Kim, Jae Hoon; Im, Seongil

    2015-08-25

    Molybdenum disulfide (MoS2) nanosheet, one of two-dimensional (2D) semiconductors, has recently been regarded as a promising material to break through the limit of present semiconductors. With an apparent energy band gap, it certainly provides a high carrier mobility, superior subthreshold swing, and ON/OFF ratio in field-effect transistors (FETs). However, its potential in carrier mobility has still been depreciated since the field-effect mobilities have only been measured from metal-insulator-semiconductor (MIS) FETs, where the transport behavior of conducting carriers located at the insulator/MoS2 interface is unavoidably interfered by the interface traps and gate voltage. Moreover, thin MoS2 MISFETs have always shown large hysteresis with unpredictable negative threshold voltages. Here, we for the first time report MoS2-based metal semiconductor field-effect transistors (MESFETs) using NiOx Schottky electrode which makes van der Waals interface with MoS2. We thus expect that the maximum mobilities or carrier transport behavior of the Schottky devices may hardly be interfered by interface traps or an on-state gate field. Our MESFETs with a few and ∼10 layer MoS2 demonstrate intrinsic-like high mobilities of 500-1200 cm(2)/(V s) at a certain low threshold voltage between -1 and -2 V without much hysteresis. Moreover, they work as a high speed and highly sensitive phototransistor with 2 ms switching and ∼5000 A/W, respectively, supporting their high intrinsic mobility results. PMID:26169189

  2. Novel reverse conducting insulated gate bipolar transistor with anti-parallel MOS controlled thyristor

    NASA Astrophysics Data System (ADS)

    Liheng, Zhu; Xingbi, Chen

    2014-07-01

    Novel reverse-conducting IGBT (RC-IGBT) with anti-parallel MOS controlled thyristor (MCT) is proposed. Its major feature is the introduction of an automatically controlled MCT at the anode, by which the anode-short effect is eliminated and the voltage snapback problem is solved. Furthermore, the snapback-free characteristics can be realized in novel RC-IGBT by a single cell with a width of 10 μm with more uniform current distribution. As numerical simulations show, compared with the conventional RC-IGBT, the forward conduction voltage is reduced by 35% while the reverse conduction voltage is reduced by 50% at J = 150 A/cm2.

  3. Symmetric complementary logic inverter using integrated black phosphorus and MoS2 transistors

    NASA Astrophysics Data System (ADS)

    Su, Yang; Kshirsagar, Chaitanya U.; Robbins, Matthew C.; Haratipour, Nazila; Koester, Steven J.

    2016-03-01

    The operation of an integrated two-dimensional complementary metal-oxide-semiconductor inverter with well-matched input/output voltages is reported. The circuit combines a few-layer MoS2 n-MOSFET and a black phosphorus (BP) p-MOSFET fabricated using a common local backgate electrode with thin (20 nm) HfO2 gate dielectric. The constituent devices have linear threshold voltages of -0.8 V and +0.8 V and produce peak transconductances of 16 μS μm-1 and 41 μS μm-1 for the MoS2 n-MOSFET and BP p-MOSFET, respectively. The inverter shows a voltage gain of 3.5 at a supply voltage, V DD = 2.5 V, and has peak switching current of 108 μA and off-state current of 8.4 μA (2.4 μA) at V IN = 0 (V IN = 2.5 V). In addition, the inverter has voltage gain greater than unity for V DD ≥ 0.5 V, has open butterfly curves for V DD ≥ 1 V, and achieves static noise margin over 500 mV at V DD = 2.5 V. The voltage gain was found to be insensitive to temperature between 270 and 340 K, and AC large and small-signal operation was demonstrated at frequencies up to 100 kHz. The demonstration of a complementary 2D inverter which operates in a symmetric voltage window suitable for driving a subsequent logic stage is a significant step forward in developing practical applications for devices based upon 2D materials.

  4. High-performance a MoS2 nanosheet-based nonvolatile memory transistor with a ferroelectric polymer and graphene source-drain electrode

    NASA Astrophysics Data System (ADS)

    Lee, Young Tack; Hwang, Do Kyung; Im, Seongil

    2015-11-01

    Two-dimensional (2D) van der Waals (vdWs) materials are a class of new materials due to their unique physical properties. Of the many 2D vdWs materials, molybdenum disulfide (MoS2) is a representative n-type transition-metal dichalcogenide (TMD) semiconductor. Here, we report on a high-performance MoS2 nanosheet-based nonvolatile memory transistor with a poly(vinylidenefluoride-trifluoroethylene) (P(VDF-TrFE)) ferroelectric top gate insulator. In order to enhance the ohmic contact property, we use graphene flakes as source/drain electrodes prepared by using the direct imprinting method with an elastomer stamp. The MoS2 ferroelectric field-effect transistor (FeFET) shows the highest linear electron mobility value of 175 cm2/Vs with a high on/off current ratio of more than 107, and a very clear memory window of more than 15 V. The program and erase dynamics and the static retention properties are also well demonstrated.

  5. Laser direct writing and inkjet printing for a sub-2 μm channel length MoS2 transistor with high-resolution electrodes.

    PubMed

    Kwon, Hyuk-Jun; Chung, Seungjun; Jang, Jaewon; Grigoropoulos, Costas P

    2016-10-01

    Patterns formed by the laser direct writing (LDW) lithography process are used either as channels or barriers for MoS2 transistors fabricated via inkjet printing. Silver (Ag) nanoparticle ink is printed over patterns formed on top of the MoS2 flakes in order to construct high-resolution source/drain (S/D) electrodes. When positive photoresist is used, the produced grooves are filled with inkjetted Ag ink by capillary forces. On the other hand, in the case of negative photoresist, convex barrier-like patterns are written on the MoS2 flakes and patterns, dividing the printed Ag ink into the S/D electrodes by self-alignment. LDW lithography combined with inkjet printing is applied to MoS2 thin-film transistors that exhibit moderate electrical performance such as mobility and subthreshold swing. However, especially in the linear operation regime, their features are limited by the contact effect. The Y-function method can exclude the contact effect and allow proper evaluation of the maximum available mobility and contact resistance. The presented fabrication methods may facilitate the development of cost-effective fabrication processes. PMID:27576743

  6. Low thermal budget selective epitaxial growth for formation of elevated source/drain MOS transistors

    NASA Astrophysics Data System (ADS)

    Nakahata, Takumi; Sugihara, Kohei; Abe, Yuji; Ozeki, Tatsuo

    2004-03-01

    We studied the dependence of selective epitaxially grown silicon (SEG-Si) morphology under ultrahigh vacuum chemical vapor deposition (UHV-CVD) conditions by using a mixture of disilane (Si 2H 6) and chlorine (Cl 2) gases on Si(1 0 0) substrates patterned a metal oxide semiconductor transistor with Si 3N 4 sidewalls. We confirmed that the morphology of the SEG-Si is strongly dependent on the dry etching conditions used for formation of the sidewall structures and that the Cl 2 plasma etching process results in lower damage to the substrate surface than CHF 3/Ar plasma etching. It was demonstrated that by combining low-damage sidewall etching with Cl 2 plasma and the UHV-CVD process with deoxidation effects it was possible to flatten the SEG-Si surface at temperatures below 700°C without the need for preheating at a higher temperature.

  7. Enhancement mode AlGaN/GaN MOS high-electron-mobility transistors with ZrO2 gate dielectric deposited by atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Anderson, Travis J.; Wheeler, Virginia D.; Shahin, David I.; Tadjer, Marko J.; Koehler, Andrew D.; Hobart, Karl D.; Christou, Aris; Kub, Francis J.; Eddy, Charles R., Jr.

    2016-07-01

    Advanced applications of AlGaN/GaN high-electron-mobility transistors (HEMTs) in high-power RF and power switching are driving the need for insulated gate technology. We present a metal–oxide–semiconductor (MOS) gate structure using atomic-layer-deposited ZrO2 as a high-k, high-breakdown gate dielectric for reduced gate leakage and a recessed barrier structure for enhancement mode operation. Compared to a Schottky metal-gate HEMT, the recessed MOS-HEMT structure demonstrated a reduction in the gate leakage current by 4 orders of magnitude and a threshold voltage shift of +6 V to a record +3.99 V, enabled by a combination of a recessed barrier structure and negative oxide charge.

  8. On the turn-around phenomenon in n-MOS transistors under NBTI conditions

    NASA Astrophysics Data System (ADS)

    Benabdelmoumene, A.; Djezzar, B.; Chenouf, A.; Tahi, H.; Zatout, B.; Kechouane, M.

    2016-07-01

    We have experimentally analyzed negative bias temperature instability (NBTI) stress/recovery cycle on n-channel metal oxide semiconductor field effect transistors (n-MOSFET's). Data obtained by current-voltage (I-V) and charge pumping (CP) techniques have revealed a turn-around phenomenon in both threshold voltage shift (ΔVth) and maximum CP current shift (ΔICP-Max). This allows us to separate the evolution of interface traps (permanent) and near interfacial oxide traps "border traps" (recoverable) as a function of the stress time. The ability of separation comes from the fact that interface and oxide traps induce opposite shifts in ΔVth. Contrarily to NBTI/n-MOSFET, NBTI/p-MOSFET is unable to achieve trap separation because both trap types induce shifts in the same direction. Exploiting the turn-around effect, we have been able to follow the evolution of the degradation over the stress time. NBTI stress/relaxation cycle CP measurements on n-MOSFET have shown a progressive creation of traps; starting from the interface traps to near interfacial traps. This new and simple procedure will give a deeper insight into the dynamics of traps build up under NBTI conditions.

  9. High-Performance WSe2, MoS2, and MoSe2 Transistors Enabled by a New Contact Strategy

    NASA Astrophysics Data System (ADS)

    Chuang, Hsun Jen; Chamlagain, Bhim; Koehler, Michael; Perera1, Meeghage Madusanka; Yan, Jiaqiang; Mandrus, David; Tománek, David; Zhou, Zhixian

    Fabrication of high-performance transistors of transition metal dichalcogenides (TMDs) including WSe2, MoS2, and MoSe2 has been a major challenge in 2D electronics. The performance of current metal-contacted TMDs is limited by the presence of a significant Schottky barrier in most cases. Here we introduce a new strategy for fabricating low-resistance ohmic contacts to a variety of TMDs. We demonstrate low contact resistance ~ 0.3 k Ωμ m, high on/off ratios up to >109, and high drive currents exceeding 320 μA μm- 1 in few-layer WSe2 field-effect transistors (FETs). These favorable characteristics are combined with a two-terminal field-effect hole mobility μFE ~ 2x102 cm2 V-1s-1 at room temperature, which increases to >2x 103 cm2 V- 1 s-1 at cryogenic temperatures. We observe a similar performance also in MoS2 and MoSe2 FETs. We acknowledge the partial support by NSF Grant Number DMR-1308436 and the WSU Presidential Research Enhancement Award.

  10. Laser Direct Writing Process for Making Electrodes and High-k Sol-Gel ZrO2 for Boosting Performances of MoS2 Transistors.

    PubMed

    Kwon, Hyuk-Jun; Jang, Jaewon; Grigoropoulos, Costas P

    2016-04-13

    A series of two-dimensional (2D) transition metal dichalcogenides (TMDCs), including molybdenum disulfide (MoS2), can be attractive materials for photonic and electronic applications due to their exceptional properties. Among these unique properties, high mobility of 2D TMDCs enables realization of high-performance nanoelectronics based on a thin film transistor (TFT) platform. In this contribution, we report highly enhanced field effect mobility (μ(eff) = 50.1 cm(2)/(V s), ∼2.5 times) of MoS2 TFTs through the sol-gel processed high-k ZrO2 (∼22.0) insulator, compared to those of typical MoS2/SiO2/Si structures (μ(eff) = 19.4 cm(2)/(V s)) because a high-k dielectric layer can suppress Coulomb electron scattering and reduce interface trap concentration. Additionally, in order to avoid costly conventional mask based photolithography and define the patterns, we employ a simple laser direct writing (LDW) process. This process allows precise and flexible control with reasonable resolution (up to ∼10 nm), depending on the system, and enables fabrication of arbitrarily patterned devices. Taking advantage of continuing developments in laser technology offers a substantial cost decrease, and LDW may emerge as a promising technology. PMID:27011225

  11. Static and Dynamic Performance of Complementary Inverters Based on Nanosheet α-MoTe2 p-Channel and MoS2 n-Channel Transistors.

    PubMed

    Pezeshki, Atiye; Hosseini Shokouh, Seyed Hossein; Jeon, Pyo Jin; Shackery, Iman; Kim, Jin Sung; Oh, Il-Kwon; Jun, Seong Chan; Kim, Hyungjun; Im, Seongil

    2016-01-26

    Molybdenum ditelluride (α-MoTe2) is an emerging transition-metal dichalcogenide (TMD) semiconductor that has been attracting attention due to its favorable optical and electronic properties. Field-effect transistors (FETs) based on few-layer α-MoTe2 nanosheets have previously shown ambipolar behavior with strong p-type and weak n-type conduction. We have employed a direct imprinting technique following mechanical nanosheet exfoliation to fabricate high-performance complementary inverters using α-MoTe2 as the semiconductor for the p-channel FETs and MoS2 as the semiconductor for the n-channel FETs. To avoid ambipolar behavior and produce α-MoTe2 FETs with clean p-channel characteristics, we have employed the high-workfunction metal platinum for the source and drain contacts. As a result, our α-MoTe2 nanosheet p-channel FETs show hole mobilities up to 20 cm(2)/(V s), on/off ratios up to 10(5), and a subthreshold slope of 255 mV/decade. For our complementary inverters composed of few-layer α-MoTe2 p-channel FETs and MoS2 n-channel FETs we have obtained voltage gains as high as 33, noise margins as high as 0.38 VDD, a switching delay of 25 μs, and a static power consumption of a few nanowatts. PMID:26631357

  12. Theory and experiments of electron-hole recombination at silicon/silicon dioxide interface traps and tunneling in thin oxide MOS transistors

    NASA Astrophysics Data System (ADS)

    Cai, Jin

    2000-10-01

    Surface recombination and channel have dominated the electrical characteristics, performance and reliability of p/n junction diodes and transistors. This dissertation uses a sensitive direct-current current voltage (DCIV) method to measure base terminal currents (IB) modulated by the gate bias (VGB) and forward p/n junction bias (VPN) in a MOS transistor (MOST). Base terminal currents originate from electron-hole recombination at Si/SiO2 interface traps. Fundamental theories which relate DCIV characteristics to device and material parameters are presented. Three theory-based applications are demonstrated on both the unstressed as well as hot-carrier-stressed MOSTs: (1) determination of interface trap density and energy levels, (2) spatial profile of interface traps in the drain/base junction-space-charge region and in the channel region, and (3) determination of gate oxide thickness and impurity doping concentrations. The results show that interface trap energy levels are discrete, which is consistent with those from silicon dangling bonds; in unstressed MOS transistors interface trap density in the channel region rises sharply toward source and drain, and after channel-hot-carrier stress, interface trap density increases mostly in the junction space-charge region. As the gate oxide thins below 3 nm, the gate oxide leakage current via quantum mechanical tunneling becomes significant. A gate oxide tunneling theory which refined the traditional WKB tunneling probability is developed for modeling tunneling currents at low electric fields through a trapezoidal SiO2 barrier. Correlation with experimental data on thin oxide MOSTs reveals two new results: (1) hole tunneling dominates over electron tunneling in p+gate p-channel MOSTs, and (2) the small gate/drain overlap region passes higher tunneling currents than the channel region under depletion to flatband gate voltages. The good theory-experimental correlation enables the extraction of impurity doping concentrations

  13. Floating gate memory-based monolayer MoS2 transistor with metal nanocrystals embedded in the gate dielectrics.

    PubMed

    Wang, Jingli; Zou, Xuming; Xiao, Xiangheng; Xu, Lei; Wang, Chunlan; Jiang, Changzhong; Ho, Johnny C; Wang, Ti; Li, Jinchai; Liao, Lei

    2015-01-14

    Charge trapping layers are formed from different metallic nanocrystals in MoS2 -based nanocrystal floating gate memory cells in a process compatible with existing fabrication technologies. The memory cells with Au nanocrystals exhibit impressive performance with a large memory window of 10 V, a high program/erase ratio of approximately 10(5) and a long retention time of 10 years. PMID:25115804

  14. Charge transport in ion-gated mono-, bi-, and trilayer MoS2 field effect transistors

    PubMed Central

    Chu, Leiqiang; Schmidt, Hennrik; Pu, Jiang; Wang, Shunfeng; Özyilmaz, Barbaros; Takenobu, Taishi; Eda, Goki

    2014-01-01

    Charge transport in MoS2 in the low carrier density regime is dominated by trap states and band edge disorder. The intrinsic transport properties of MoS2 emerge in the high density regime where conduction occurs via extended states. Here, we investigate the transport properties of mechanically exfoliated mono-, bi-, and trilayer MoS2 sheets over a wide range of carrier densities realized by a combination of ion gel top gate and SiO2 back gate, which allows us to achieve high charge carrier (>1013 cm−2) densities. We discuss the gating properties of the devices as a function of layer thickness and demonstrate resistivities as low as 1 kΩ for monolayer and 420 Ω for bilayer devices at 10 K. We show that from the capacitive coupling of the two gates, quantum capacitance can be roughly estimated to be on the order of 1 μF/cm2 for all devices studied. The temperature dependence of the carrier mobility in the high density regime indicates that short-range scatterers limit charge transport at low temperatures. PMID:25465059

  15. Finding the asymmetric parasitic source and drain resistances from the a.c. conductances of a single MOS transistor

    NASA Astrophysics Data System (ADS)

    Raychaudhuri, A.; Deen, M. J.; King, M. I. H.; Kolk, J.

    1996-06-01

    Layout asymmetry, processing, or hot-carrier stressing can give rise to unequal source and drain parasitic resistances in a MOSFET. In these cases, it is necessary to extract these resistances separately without the aid of other transistors. In this paper, we present a simple method to extract the source and drain parasitic resistances separately. This method, unlike earlier ones that depend on the measurements of the d.c. resistances of several MOSFETs, is based on accurate formulations and measurements of the a.c. conductances with respect to the gate and drain terminals of a single transistor. This allows us to get reasonably accurate estimates of these resistances in a more straightforward manner. We also discuss the main error terms in detail.

  16. CADAT field-effect-transistor simulator

    NASA Technical Reports Server (NTRS)

    1981-01-01

    CADAT field-effect transistor simulator (FETSIM) analyzes dc and transient behavior of metal-oxide-semiconductor (MOS) circuits. Both N-MOS and P-MOS transistor configurations in either bulk of silicon-on-sapphire (SOS) technology and almost any combination of R/C elements are analyzed.

  17. Low-Resistance 2D/2D Ohmic Contacts: A Universal Approach to High-Performance WSe2, MoS2, and MoSe2Transistors

    NASA Astrophysics Data System (ADS)

    Chuang, Hsun-Jen; Chamlagain, Bhim; Koehler, Michael; Perera, Meeghage Madusanka; Yan, Jiaqiang; Mandrus, David; Tománek, David; Zhou, Zhixian

    2016-03-01

    We report a new strategy for fabricating 2D/2D low-resistance ohmic contacts for a variety of transition metal dichalcogenides (TMDs) using van der Waals assembly of substitutionally doped TMDs as drain/source contacts and TMDs with no intentional doping as channel materials. We demonstrate that few-layer WSe2 field-effect transistors (FETs) with 2D/2D contacts exhibit low contact resistances of ~ 0.3 k ohm.um, high on/off ratios up to > 109, and high drive currents exceeding 320 uA um-1. These favorable characteristics are combined with a two-terminal field-effect hole mobility ~ 2x102 cm2 V-1 s-1 at room temperature, which increases to >2x103 cm2 V-1 s-1 at cryogenic temperatures. We observe a similar performance also in MoS2 and MoSe2 FETs with 2D/2D drain and source contacts. The 2D/2D low-resistance ohmic contacts presented here represent a new device paradigm that overcomes a significant bottleneck in the performance of TMDs and a wide variety of other 2D materials as the channel materials in post-silicon electronics.

  18. Low-Resistance 2D/2D Ohmic Contacts: A Universal Approach to High-Performance WSe2, MoS2, and MoSe2 Transistors.

    PubMed

    Chuang, Hsun-Jen; Chamlagain, Bhim; Koehler, Michael; Perera, Meeghage Madusanka; Yan, Jiaqiang; Mandrus, David; Tománek, David; Zhou, Zhixian

    2016-03-01

    We report a new strategy for fabricating 2D/2D low-resistance ohmic contacts for a variety of transition metal dichalcogenides (TMDs) using van der Waals assembly of substitutionally doped TMDs as drain/source contacts and TMDs with no intentional doping as channel materials. We demonstrate that few-layer WSe2 field-effect transistors (FETs) with 2D/2D contacts exhibit low contact resistances of ∼0.3 kΩ μm, high on/off ratios up to >10(9), and high drive currents exceeding 320 μA μm(-1). These favorable characteristics are combined with a two-terminal field-effect hole mobility μFE ≈ 2 × 10(2) cm(2) V(-1) s(-1) at room temperature, which increases to >2 × 10(3) cm(2) V(-1) s(-1) at cryogenic temperatures. We observe a similar performance also in MoS2 and MoSe2 FETs with 2D/2D drain and source contacts. The 2D/2D low-resistance ohmic contacts presented here represent a new device paradigm that overcomes a significant bottleneck in the performance of TMDs and a wide variety of other 2D materials as the channel materials in postsilicon electronics. PMID:26844954

  19. Transfer characteristics and low-frequency noise in single- and multi-layer MoS2 field-effect transistors

    NASA Astrophysics Data System (ADS)

    Sharma, Deepak; Motayed, Abhishek; Shah, Pankaj B.; Amani, Matin; Georgieva, Mariela; Glen Birdwell, A.; Dubey, Madan; Li, Qiliang; Davydov, Albert V.

    2015-10-01

    Leveraging nanoscale field-effect transistors (FETs) in integrated circuits depends heavily on its transfer characteristics and low-frequency noise (LFN) properties. Here, we report the transfer characteristics and LFN in FETs fabricated with molybdenum disulfide (MoS2) with different layer (L) counts. 4L to 6L devices showed highest ION-IOFF ratio (≈108) whereas LFN was maximum for 1L device with normalized power spectral density (PSD) ≈1.5 × 10-5 Hz-1. For devices with L ≈ 6, PSD was minimum (≈2 × 10-8 Hz-1). Further, LFN for single and few layer devices satisfied carrier number fluctuation (CNF) model in both weak and strong accumulation regimes while thicker devices followed Hooge's mobility fluctuation model in the weak accumulation regime and CNF model in strong accumulation regime, respectively. Transfer-characteristics and LFN experimental data are explained with the help of model incorporating Thomas-Fermi charge screening and inter-layer resistance coupling.

  20. Substrate dependence of Hall and Field-effect mobilities in few-layer MoS2 field-effect transistors

    NASA Astrophysics Data System (ADS)

    Chamlagain, Bhim; Perera, Meeghage; Chuang, Hsuen-Jen; Bowman, Arthur; Rijal, Upendra; Andrews, Kraig; Klesko, Joseph; Winter, Charles; Zhou, Zhixian

    In this work, we systematically study the Hall and field-effect mobilities of few-layer MoS2 FETs fabricated on different substrates. Hall bar devices were fabricated on SiO2 and hBN to directly measure carrier density. Standard four-probe transport measurement and Hall effect measurement were carried out for a wide temperature range to determine the carrier mobility and understand the scattering mechanisms. By comparing field-effect and Hall mobilities, we demonstrate that the intrinsic drift mobility of multiplayer MoS2 in the high carrier density metallic region is independent of substrate and sample thickness. While the optical-phonon scattering remains the dominant scattering mechanism in MoS2 devices on h-BN down to ~100 K, extrinsic scattering mechanisms start to degrade the carrier mobility of MoS2 on all other substrates below ~200 K. NSF Grant Number DMR-1308436.

  1. Impact of Contact on the Operation and Performance of Back-Gated Monolayer MoS2 Field-Effect-Transistors.

    PubMed

    Liu, Wei; Sarkar, Deblina; Kang, Jiahao; Cao, Wei; Banerjee, Kaustav

    2015-08-25

    Metal contacts to atomically thin two-dimensional (2D) crystal based FETs play a decisive role in determining their operation and performance. However, the effects of contacts on the switching behavior, field-effect mobility, and current saturation of monolayer MoS2 FETs have not been well explored and, hence, is the focus of this work. The dependence of contact resistance on the drain current is revealed by four-terminal-measurements. Without high-κ dielectric boosting, an electron mobility of 44 cm(2)/(V·s) has been achieved in a monolayer MoS2 FET on SiO2 substrate at room temperature. Velocity saturation is identified as the main mechanism responsible for the current saturation in back-gated monolayer MoS2 FETs at relatively higher carrier densities. Furthermore, for the first time, electron saturation velocity of monolayer MoS2 is extracted at high-field condition. PMID:26039221

  2. MOS integrated circuit fault modeling

    NASA Technical Reports Server (NTRS)

    Sievers, M.

    1985-01-01

    Three digital simulation techniques for MOS integrated circuit faults were examined. These techniques embody a hierarchy of complexity bracketing the range of simulation levels. The digital approaches are: transistor-level, connector-switch-attenuator level, and gate level. The advantages and disadvantages are discussed. Failure characteristics are also described.

  3. MOSFET and MOS capacitor responses to ionizing radiation

    NASA Technical Reports Server (NTRS)

    Benedetto, J. M.; Boesch, H. E., Jr.

    1984-01-01

    The ionizing radiation responses of metal oxide semiconductor (MOS) field-effect transistors (FETs) and MOS capacitors are compared. It is shown that the radiation-induced threshold voltage shift correlates closely with the shift in the MOS capacitor inversion voltage. The radiation-induced interface-state density of the MOSFETs and MOS capacitors was determined by several techniques. It is shown that the presence of 'slow' states can interfere with the interface-state measurements.

  4. Tuning the threshold voltage from depletion to enhancement mode in a multilayer MoS2 transistor via oxygen adsorption and desorption.

    PubMed

    Jiang, Jie; Dhar, Sarit

    2016-01-14

    Selective chemical doping in two-dimensional (2D) molybdenum disulfide (MoS2) is attractive for tailoring electrical properties according to device requirements. However, the ultra-thin 2D nature of MoS2 makes it difficult to realize effective doping by conventional ion implantation. Here, a simple method based on low-temperature (150 °C) annealing in air is developed for effective chemical doping in MoS2. We have demonstrated that the threshold voltage (V(th)) of multilayer MoS2 FET can be effectively tuned from depletion mode (V(th) = -1.8 V) to enhancement mode (V(th) = 1.1 V) by annealing in air at 150 °C. An energy band model based on electron trapping/detrapping due to oxygen adsorption on the MoS2 surface is proposed to explain the underlying mechanism. The model is consistent with an oxygen adsorption-desorption process evidenced by vacuum annealing that recovers the V(th) to its original value. These results can provide a simple approach for V(th) engineering and make a significant step toward 2D nanoelectronic device applications. PMID:26658374

  5. Fabrication of high-k/metal-gate MoS2 field-effect transistor by device isolation process utilizing Ar-plasma etching

    NASA Astrophysics Data System (ADS)

    Ninomiya, Naruki; Mori, Takahiro; Uchida, Noriyuki; Watanabe, Eiichiro; Tsuya, Daiju; Moriyama, Satoshi; Tanaka, Masatoshi; Ando, Atsushi

    2015-04-01

    We investigated a device isolation process for MoS2-based devices and fabricated high-k/metal-gate MoS2 MOSFETs. An Ar-ion etching process was utilized for the device isolation process. It circumvents damage in the device channel, as confirmed by Raman spectroscopy. A top-gate MoS2 MOSFET was fabricated with a HfO2 thin film 16 nm thick as the gate insulator. Utilizing capacitance-voltage (C-V) measurements, the capacitance equivalent thickness (CET) was estimated to be 5.36 nm, which indicates that a gate stack with the sufficiently thin insulator was successfully realized. The device exhibited a mobility of 25.3 cm2/(V·s), a subthreshold swing (SS) of 86.0 mV/decade, and an ON/OFF ratio of 107. This satisfactory device performance demonstrates the feasibility of the proposed device isolation process.

  6. High quality PECVD SiO2 process for recessed MOS-gate of AlGaN/GaN-on-Si metal–oxide–semiconductor heterostructure field-effect transistors

    NASA Astrophysics Data System (ADS)

    Lee, Jae-Gil; Kim, Hyun-Seop; Seo, Kwang-Seok; Cho, Chun-Hyung; Cha, Ho-Young

    2016-08-01

    A high quality SiO2 deposition process using a plasma enhanced chemical vapor deposition system has been developed for the gate insulator process of normally-off recessed-gate AlGaN/GaN metal-oxide-semiconductor-heterostructure field-effect transistors (MOS-HFETs). SiO2 films were deposited by using SiH4 and N2O mixtures as reactant gases. The breakdown field increased with increasing the N2O flow rate. The optimum SiH4/N2O ratio was 0.05, which resulted in a maximum breakdown field of 11 MV/cm for the SiO2 film deposited on recessed GaN surface. The deposition conditions were optimized as follows; a gas flow rate of SiH4/N2O (=27/540 sccm), a source RF power of 100 W, a pressure of 2 Torr, and a deposition temperature of 350 °C. A fabricated normally-off MOS-HFET exhibited a threshold voltage of 3.2 V, a specific on-resistance of 4.46 mΩ cm2, and a breakdown voltage of 810 V.

  7. Negative differential resistance and effect of defects and deformations in MoS2 armchair nanoribbon metal-oxide-semiconductor field effect transistor

    NASA Astrophysics Data System (ADS)

    Sengupta, Amretashis; Mahapatra, Santanu

    2013-11-01

    In this work, we present a study on the negative differential resistance (NDR) behavior and the impact of various deformations (like ripple, twist, wrap) and defects like vacancies and edge roughness on the electronic properties of short-channel MoS2 armchair nanoribbon MOSFETs. The effect of deformation (3°-7° twist or wrap and 0.3-0.7 Å ripple amplitude) and defects on a 10 nm MoS2 ANR FET is evaluated by the density functional tight binding theory and the non-equilibrium Green`s function approach. We study the channel density of states, transmission spectra, and the ID-VD characteristics of such devices under the varying conditions, with focus on the NDR behavior. Our results show significant change in the NDR peak to valley ratio and the NDR window with such minor intrinsic deformations, especially with the ripple.

  8. Highly Stable, Dual-Gated MoS2 Transistors Encapsulated by Hexagonal Boron Nitride with Gate-Controllable Contact, Resistance, and Threshold Voltage.

    PubMed

    Lee, Gwan-Hyoung; Cui, Xu; Kim, Young Duck; Arefe, Ghidewon; Zhang, Xian; Lee, Chul-Ho; Ye, Fan; Watanabe, Kenji; Taniguchi, Takashi; Kim, Philip; Hone, James

    2015-07-28

    Emerging two-dimensional (2D) semiconductors such as molybdenum disulfide (MoS2) have been intensively studied because of their novel properties for advanced electronics and optoelectronics. However, 2D materials are by nature sensitive to environmental influences, such as temperature, humidity, adsorbates, and trapped charges in neighboring dielectrics. Therefore, it is crucial to develop device architectures that provide both high performance and long-term stability. Here we report high performance of dual-gated van der Waals (vdW) heterostructure devices in which MoS2 layers are fully encapsulated by hexagonal boron nitride (hBN) and contacts are formed using graphene. The hBN-encapsulation provides excellent protection from environmental factors, resulting in highly stable device performance, even at elevated temperatures. Our measurements also reveal high-quality electrical contacts and reduced hysteresis, leading to high two-terminal carrier mobility (33-151 cm(2) V(-1) s(-1)) and low subthreshold swing (80 mV/dec) at room temperature. Furthermore, adjustment of graphene Fermi level and use of dual gates enable us to separately control contact resistance and threshold voltage. This novel vdW heterostructure device opens up a new way toward fabrication of stable, high-performance devices based on 2D materials. PMID:26083310

  9. A study of lateral Schottky contacts in WSe2 and MoS2 field effect transistors using scanning photocurrent microscopy.

    PubMed

    Yi, Ya; Wu, Changming; Liu, Hongchao; Zeng, Jiali; He, Hongtao; Wang, Jiannong

    2015-10-14

    Schottky contacts, formed at metal/semiconductor interfaces, always have a large impact on the performance of field-effect transistors (FETs). Here, we report the experimental studies of Schottky contacts in two-dimensional (2D) transition metal dichalcogenide (TMDC) FET devices. We use scanning photocurrent microscopy (SPCM) to directly probe the spatial distribution of the in-plane lateral Schottky depletion regions at the metal/2D-TMDC interfaces. The laser incident position dependent and the gate voltage tunable polarity and magnitude of the short-circuit photocurrent reveal the existence of the in-plane Schottky depletion region laterally extending away from the metal contact edges along the channel. This lateral depletion region length is estimated to be around several microns and can be effectively tuned by the gate and drain-source biases. Our results solidify the importance of lateral Schottky depletion regions in the photoresponse of 2D TMDC optoelectronic devices. PMID:26350431

  10. John Bardeen and transistor physics

    NASA Astrophysics Data System (ADS)

    Huff, Howard R.

    2001-01-01

    John Bardeen and Walter Brattain invented the point-contact semiconductor amplifier (transistor action) in polycrystalline germanium (also observed in polycrystalline silicon) on Dec. 15, 1947, for which they received a patent on Oct. 3, 1950. Bill Shockley was not a co-patent holder on Bardeen and Brattain's point-contact semiconductor amplifier patent since Julius Lilienfeld had already received a patent in 1930 for what would have been Shockley's contribution; namely, the field-effect methodology. Shockley received patents for both his minority-carrier injection concept and junction transistor theory, however, and deservedly shared the Nobel prize with Bardeen and Brattain for his seminal contributions of injection, p-n junction theory and junction transistor theory. We will review the events leading up to the invention of Bardeen and Brattain's point-contact semiconductor amplifier during the magic month of November 17-December 16, 1947 and the invention of Shockley's junction semiconductor amplifier during his magic month of December 24, 1947-January 23, 1948. It was during the course of Bardeen and Brattain's research in November, 1947 that Bardeen also patented the essence of the MOS transistor, wherein the induced minority carriers were confined to the inversion layer enroute to the collector. C. T. Sah has described this device as a sourceless MOS transistor. Indeed, John Bardeen, co-inventor of the point-contact semiconductor amplifier and inventor of the MOS transistor, may rightly be called the father of modern electronics.

  11. Suspended MoS2 devices

    NASA Astrophysics Data System (ADS)

    Jin, Taiyu; Kang, Jinyoung; Liu, Renlong; Kim, Youngchan; Lee, Changgu

    2013-03-01

    Single or a few layer MoS2 sheets have been reported to have high electric mobility and current on/off ratio comparable to those of silicon due to its semiconductor properties with bandgap of 1.3 ~ 1.9eV. However, its extremely high surface to volume ratio and low thickness prohibits it from reproducing its electronic properties on SiO2 substrates possibly because of charge scattering by surface charges and phonons. In order to investigate these surface effects, we fabricated MoS2 devices suspended from the SiO2 and characterized their electronic transport properties. We exfoliated single or a few layer MoS2 on SiO2 substrates first, and fabricated field effect transistors using e-beam lithography. After that, we suspended MoS2 sheets by etching SiO2 with hydrofluoric acid. We measured mobility and current on/off ratio before and after the etching process. We found that mobility of MoS2 devices increased by factor of 5-10 after etching for all devices. However, on/off ratio did not show significant variation. Our measurements suggest that atomically thin MoS2 devices are significantly affected by substrate surface and environment.

  12. Quantitative evaluation of slow traps near Ge MOS interfaces by using time response of MOS capacitance

    NASA Astrophysics Data System (ADS)

    Tanaka, Katsuhisa; Zhang, Rui; Takenaka, Mitsuru; Takagi, Shinichi

    2015-04-01

    Time-dependent changes in current and threshold voltage due to slow traps near Ge metal-oxide-semiconductor (MOS) interfaces is one of the most serious problems in Ge metal-oxide-semiconductor field-effect transistors (MOSFETs). In this study, we propose a new evaluation method of slow traps near MOS interfaces utilizing the time response of capacitance in MOS capacitors at a constant gate voltage, allowing us to evaluate the density and time constant of slow traps. We apply this method to Au/Al2O3/GeOx/Ge MOS capacitors and evaluate the density and average time constant of slow traps. The slow trap density of n-Ge MOS capacitors is found to be much larger than that of p-Ge MOS capacitors, indicating that a higher density of slow traps exists near the conduction band edge. We also examine the effects of post deposition annealing in a variety of ambient gases, including several hydrogen-based species, on the properties of slow traps.

  13. MoS2 Surface Structure Tailoring via Carbonaceous Promoter

    PubMed Central

    Shi, Yumeng; Li, Henan; Wong, Jen It; Zhang, Xiaoting; Wang, Ye; Song, Huaihe; Yang, Hui Ying

    2015-01-01

    Atomically thin semiconducting transition-metal dichalcogenides have been attracting lots of attentions, particularly, molybdenum disulfide (MoS2) monolayers show promising applications in field effect transistors, optoelectronics and valleytronics. However, the controlled synthesis of highly crystalline MoS2 remain a challenge especially the systematic approach to manipulate its structure and morphology. Herein, we report a method for controlled synthesis of highly crystalline MoS2 by using chemical vapor deposition method with carbonaceous materials as growth promoter. A uniform and highly crystalline MoS2 monolayer with the grain size close to 40 μm was achieved. Furthermore, we extend the method to the manipulation of MoS2 morphology, flower-shape vertical grown MoS2 layers were obtained on growth promoting substrates. This simple approach allows an easy access of highly crystalline MoS2 layers with morphology tuned in a controllable manner. Moreover, the flower-shape MoS2 grown on graphene oxide film used as an anode material for lithium-ion batteries showed excellent electrochemical performance. PMID:25994238

  14. STM study of monolayer MoS2 synthesized by Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Mills, Adam; Chen, Chuanhui; Yu, Yifei; Cao, Linyui; Tao, Changgang

    2014-03-01

    Monolayer molybdenum disulfide (MoS2) , an atomically thin transition-metal dichalcogenide semiconductor with a direct band gap, as opposed to an indirect band gap in bulk MoS2, has recently captured a lot of research interest for its distinctive optical and electronic properties, and potential applications such as field effect transistors, optoelectronic devices and chemical sensors. Using scanning tunneling microscopy, we have investigated monolayer MoS2 synthesized by chemical vapor deposition. The structural and electronic properties of monolayer MoS2 grown on glassy carbon and other substrates will be presented. We will also discuss our preliminary scanning tunneling spectroscopy measurements on these samples.

  15. Chemical sensing with ultra-thin MoS2

    NASA Astrophysics Data System (ADS)

    Friedman, Adam; Perkins, Keith; Cobas, Enrique; Campbell, Paul; Jernigan, Glenn; Jonker, Berend

    2013-03-01

    Although the majority of focus and excitement in recent years has been on studying the remarkable properties of single atomic-layer graphene, there exists a whole class of materials called dichalcogenides that are relatively easily fabricated in single-crystal mono- or few-layer format. Graphene, being chemically inert, does not lend itself to chemical sensing applications. However, MoS2, a dichalcogenide of recent interest because of its potential for transistor applications, possesses many advantageous properties for chemical sensing. Two primary examples include a sizable bandgap, which is necessary for fabricating transistors with large on/off current ratios, and a chemically reactive surface, which is necessary for easy surface functionalization. In this talk, we discuss our current research effort on MoS2 chemical sensors. We discuss aspects of transistor device fabrication and chemical sensing experiments. We expose MoS2 chemical sensors to a variety of analytes, finding the best response to triethylamine, a nerve gas by product, and explain our results based on a donor-acceptor model. MoS2 sensors are compared to other similar low-dimensional sensors and found to be of comparable quality.

  16. Reducing Sodium Contamination in MOS Devices

    NASA Technical Reports Server (NTRS)

    Dehaye, R. F.; Feltner, W. R.

    1986-01-01

    Method of removing positive ions from oxides in metal-oxide-semiconductor (MOS) transistors and intergrated circuits ensure freedom from contamination by sodium and other mobile positive ions. Electric field applied during oxide growth to push mobile Na + ions to surface. After cooling from growth temperature, field turned off and Na + contaminated surface layer etched away. New method intended to suplement established methods of minimizing ion contamination, such as scrupulous cleanliness in processing, purging with hydrogen chloride to react with and remove contaminants, and growing extra-thick gate oxide, then etching it to remove large portion of contaminants concentrated near surface.

  17. Tuning the hysteresis voltage in 2D multilayer MoS2 FETs

    NASA Astrophysics Data System (ADS)

    Jiang, Jie; Zheng, Zhouming; Guo, Junjie

    2016-10-01

    The hysteresis tuning is of great significance before the two-dimensional (2D) molybdenum disulfide (MoS2) field-effect transistors (FETs) can be practically used in the next-generation nanoelectronic devices. In this paper, a simple and effective annealing method was developed to tune the hysteresis voltage in 2D MoS2 transistors. It was found that high temperature (175 °C) annealing in air could increase the hysteresis voltage from 8.0 V (original device) to 28.4 V, while a next vacuum annealing would reduce the hysteresis voltage to be only 2.0 V. An energyband diagram model based on electron trapping/detrapping due to oxygen adsorption is proposed to understand the hysteresis mechanism in multilayer MoS2 FET. This simple method for tuning the hysteresis voltage of MoS2 FET can make a significant step toward 2D nanoelectronic device applications.

  18. Integrated circuits based on bilayer MoS₂ transistors.

    PubMed

    Wang, Han; Yu, Lili; Lee, Yi-Hsien; Shi, Yumeng; Hsu, Allen; Chin, Matthew L; Li, Lain-Jong; Dubey, Madan; Kong, Jing; Palacios, Tomas

    2012-09-12

    Two-dimensional (2D) materials, such as molybdenum disulfide (MoS(2)), have been shown to exhibit excellent electrical and optical properties. The semiconducting nature of MoS(2) allows it to overcome the shortcomings of zero-bandgap graphene, while still sharing many of graphene's advantages for electronic and optoelectronic applications. Discrete electronic and optoelectronic components, such as field-effect transistors, sensors, and photodetectors made from few-layer MoS(2) show promising performance as potential substitute of Si in conventional electronics and of organic and amorphous Si semiconductors in ubiquitous systems and display applications. An important next step is the fabrication of fully integrated multistage circuits and logic building blocks on MoS(2) to demonstrate its capability for complex digital logic and high-frequency ac applications. This paper demonstrates an inverter, a NAND gate, a static random access memory, and a five-stage ring oscillator based on a direct-coupled transistor logic technology. The circuits comprise between 2 to 12 transistors seamlessly integrated side-by-side on a single sheet of bilayer MoS(2). Both enhancement-mode and depletion-mode transistors were fabricated thanks to the use of gate metals with different work functions. PMID:22862813

  19. Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer

    PubMed Central

    Qian, Qingkai; Li, Baikui; Hua, Mengyuan; Zhang, Zhaofu; Lan, Feifei; Xu, Yongkuan; Yan, Ruyue; Chen, Kevin J.

    2016-01-01

    Transistors based on MoS2 and other TMDs have been widely studied. The dangling-bond free surface of MoS2 has made the deposition of high-quality high-k dielectrics on MoS2 a challenge. The resulted transistors often suffer from the threshold voltage instability induced by the high density traps near MoS2/dielectric interface or inside the gate dielectric, which is detrimental for the practical applications of MoS2 metal-oxide-semiconductor field-effect transistor (MOSFET). In this work, by using AlN deposited by plasma enhanced atomic layer deposition (PEALD) as an interfacial layer, top-gate dielectrics as thin as 6 nm for single-layer MoS2 transistors are demonstrated. The AlN interfacial layer not only promotes the conformal deposition of high-quality Al2O3 on the dangling-bond free MoS2, but also greatly enhances the electrical stability of the MoS2 transistors. Very small hysteresis (ΔVth) is observed even at large gate biases and high temperatures. The transistor also exhibits a low level of flicker noise, which clearly originates from the Hooge mobility fluctuation instead of the carrier number fluctuation. The observed superior electrical stability of MoS2 transistor is attributed to the low border trap density of the AlN interfacial layer, as well as the small gate leakage and high dielectric strength of AlN/Al2O3 dielectric stack. PMID:27279454

  20. Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer.

    PubMed

    Qian, Qingkai; Li, Baikui; Hua, Mengyuan; Zhang, Zhaofu; Lan, Feifei; Xu, Yongkuan; Yan, Ruyue; Chen, Kevin J

    2016-01-01

    Transistors based on MoS2 and other TMDs have been widely studied. The dangling-bond free surface of MoS2 has made the deposition of high-quality high-k dielectrics on MoS2 a challenge. The resulted transistors often suffer from the threshold voltage instability induced by the high density traps near MoS2/dielectric interface or inside the gate dielectric, which is detrimental for the practical applications of MoS2 metal-oxide-semiconductor field-effect transistor (MOSFET). In this work, by using AlN deposited by plasma enhanced atomic layer deposition (PEALD) as an interfacial layer, top-gate dielectrics as thin as 6 nm for single-layer MoS2 transistors are demonstrated. The AlN interfacial layer not only promotes the conformal deposition of high-quality Al2O3 on the dangling-bond free MoS2, but also greatly enhances the electrical stability of the MoS2 transistors. Very small hysteresis (ΔVth) is observed even at large gate biases and high temperatures. The transistor also exhibits a low level of flicker noise, which clearly originates from the Hooge mobility fluctuation instead of the carrier number fluctuation. The observed superior electrical stability of MoS2 transistor is attributed to the low border trap density of the AlN interfacial layer, as well as the small gate leakage and high dielectric strength of AlN/Al2O3 dielectric stack. PMID:27279454

  1. Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer

    NASA Astrophysics Data System (ADS)

    Qian, Qingkai; Li, Baikui; Hua, Mengyuan; Zhang, Zhaofu; Lan, Feifei; Xu, Yongkuan; Yan, Ruyue; Chen, Kevin J.

    2016-06-01

    Transistors based on MoS2 and other TMDs have been widely studied. The dangling-bond free surface of MoS2 has made the deposition of high-quality high-k dielectrics on MoS2 a challenge. The resulted transistors often suffer from the threshold voltage instability induced by the high density traps near MoS2/dielectric interface or inside the gate dielectric, which is detrimental for the practical applications of MoS2 metal-oxide-semiconductor field-effect transistor (MOSFET). In this work, by using AlN deposited by plasma enhanced atomic layer deposition (PEALD) as an interfacial layer, top-gate dielectrics as thin as 6 nm for single-layer MoS2 transistors are demonstrated. The AlN interfacial layer not only promotes the conformal deposition of high-quality Al2O3 on the dangling-bond free MoS2, but also greatly enhances the electrical stability of the MoS2 transistors. Very small hysteresis (ΔVth) is observed even at large gate biases and high temperatures. The transistor also exhibits a low level of flicker noise, which clearly originates from the Hooge mobility fluctuation instead of the carrier number fluctuation. The observed superior electrical stability of MoS2 transistor is attributed to the low border trap density of the AlN interfacial layer, as well as the small gate leakage and high dielectric strength of AlN/Al2O3 dielectric stack.

  2. A generic tight-binding model for monolayer, bilayer and bulk MoS2

    NASA Astrophysics Data System (ADS)

    Zahid, Ferdows; Liu, Lei; Zhu, Yu; Wang, Jian; Guo, Hong

    2013-05-01

    Molybdenum disulfide (MoS2) is a layered semiconductor which has become very important recently as an emerging electronic device material. Being an intrinsic semiconductor the two-dimensional MoS2 has major advantages as the channel material in field-effect transistors. In this work we determine the electronic structures of MoS2 with the highly accurate screened hybrid functional within the density functional theory (DFT) including the spin-orbit coupling. Using the DFT electronic structures as target, we have developed a single generic tight-binding (TB) model that accurately produces the electronic structures for three different forms of MoS2 - bulk, bilayer and monolayer. Our TB model is based on the Slater-Koster method with non-orthogonal sp3d5 orbitals, nearest-neighbor interactions and spin-orbit coupling. The TB model is useful for atomistic modeling of quantum transport in MoS2 based electronic devices.

  3. Effects of plasma treatment on surface properties of ultrathin layered MoS2

    NASA Astrophysics Data System (ADS)

    Kim, Suhhyun; Choi, Min Sup; Qu, Deshun; Ra, Chang Ho; Liu, Xiaochi; Kim, Minwoo; Song, Young Jae; Jong Yoo, Won

    2016-09-01

    This work investigates the use of oxygen plasma (O2) treatment, applied as an inductively coupled plasma, to control the thickness and work function of a MoS2 layer. Plasma-etched MoS2 exhibited a surface roughness similar to that of the pristine MoS2. The MoS2 field effect transistors fabricated using the plasma-etched MoS2 displayed a higher n-type doping concentration than that of pristine MoS2. The x-ray photoelectron spectroscopy was performed to analyze chemical composition to demonstrate the minimum level of chemical reactions occurred upon plasma treatment. Moreover, Kelvin probe force microscopy measurements were conducted to probe the changes in the work function that could be attributed to the changes in the surface potential. The measured work functions suggest the modification of a band structure and n-doping effect after plasma treatments that depended on the number of MoS2 layers. This study suggests that the O2 plasma can control the layer number of the MoS2 as well as the electronic properties of a MoS2 film.

  4. Photothermoelectric and photovoltaic effects both present in MoS2

    NASA Astrophysics Data System (ADS)

    Zhang, Youwei; Li, Hui; Wang, Lu; Wang, Haomin; Xie, Xiaomin; Zhang, Shi-Li; Liu, Ran; Qiu, Zhi-Jun

    2015-01-01

    As a finite-energy-bandgap alternative to graphene, semiconducting molybdenum disulfide (MoS2) has recently attracted extensive interest for energy and sensor applications. In particular for broad-spectral photodetectors, multilayer MoS2 is more appealing than its monolayer counterpart. However, little is understood regarding the physics underlying the photoresponse of multilayer MoS2. Here, we employ scanning photocurrent microscopy to identify the nature of photocurrent generated in multilayer MoS2 transistors. The generation and transport of photocurrent in multilayer MoS2 are found to differ from those in other low-dimensional materials that only contribute with either photovoltaic effect (PVE) or photothermoelectric effect (PTE). In multilayer MoS2, the PVE at the MoS2-metal interface dominates in the accumulation regime whereas the hot-carrier-assisted PTE prevails in the depletion regime. Besides, the anomalously large Seebeck coefficient observed in multilayer MoS2, which has also been reported by others, is caused by hot photo-excited carriers that are not in thermal equilibrium with the MoS2 lattice.

  5. Thermal management in MoS2 based integrated device using near-field radiation

    NASA Astrophysics Data System (ADS)

    Peng, Jiebin; Zhang, Gang; Li, Baowen

    2015-09-01

    Recently, wafer-scale growth of monolayer MoS2 films with spatial homogeneity is realized on SiO2 substrate. Together with the latest reported high mobility, MoS2 based integrated electronic devices are expected to be fabricated in the near future. Owing to the low lattice thermal conductivity in monolayer MoS2, and the increased transistor density accompanied with the increased power density, heat dissipation will become a crucial issue for these integrated devices. In this letter, using the formalism of fluctuation electrodynamics, we explored the near-field radiative heat transfer from a monolayer MoS2 to graphene. We demonstrate that in resonance, the maximum heat transfer via near-field radiation between MoS2 and graphene can be ten times higher than the in-plane lattice thermal conduction for MoS2 sheet. Therefore, an efficient thermal management strategy for MoS2 integrated device is proposed: Graphene sheet is brought into close proximity, 10-20 nm from MoS2 device; heat energy transfer from MoS2 to graphene via near-field radiation; this amount of heat energy then be conducted to contact due to ultra-high lattice thermal conductivity of graphene. Our work sheds light for developing cooling strategy for nano devices constructing with low thermal conductivity materials.

  6. Selective Decoration of Au Nanoparticles on Monolayer MoS2 Single Crystals

    PubMed Central

    Shi, Yumeng; Huang, Jing-Kai; Jin, Limin; Hsu, Yu-Te; Yu, Siu Fung; Li, Lain-Jong; Yang, Hui Ying

    2013-01-01

    We report a controllable wet method for effective decoration of 2-dimensional (2D) molybdenum disulfide (MoS2) layers with Au nanoparticles (NPs). Au NPs can be selectively formed on the edge sites or defective sites of MoS2 layers. The Au-MoS2 nano-composites are formed by non-covalent bond. The size distribution, morphology and density of the metal nanoparticles can be tuned by changing the defect density in MoS2 layers. Field effect transistors were directly fabricated by placing ion gel gate dielectrics on Au-decorated MoS2 layers without the need to transfer these MoS2 layers to SiO2/Si substrates for bottom gate devices. The ion gel method allows probing the intrinsic electrical properties of the as-grown and Au-decorated MoS2 layers. This study shows that Au NPs impose remarkable p-doping effects to the MoS2 transistors without degrading their electrical characteristics. PMID:23670611

  7. Improving crystalline quality of sputtering-deposited MoS2 thin film by postdeposition sulfurization annealing using (t-C4H9)2S2

    NASA Astrophysics Data System (ADS)

    Ishihara, Seiya; Hibino, Yusuke; Sawamoto, Naomi; Suda, Kohei; Ohashi, Takumi; Matsuura, Kentarou; Machida, Hideaki; Ishikawa, Masato; Sudoh, Hiroshi; Wakabayashi, Hitoshi; Ogura, Atsushi

    2016-04-01

    A sputtered MoS2 thin film is a candidate for realizing enhancement-mode MoS2 metal-oxide-semiconductor field-effect transistors (MOSFETs). However, there are some sulfur vacancies in the film, which degrade the device performance. In this study, we performed postdeposition sulfurization annealing (PSA) on a sputtered MoS2 thin film in order to complement sulfur vacancies, and we investigated the fundamental properties of the MoS2 film. As a result, a high-quality crystalline 10-layer MoS2 film with an ideal stoichiometric composition was obtained at a relatively low process temperature (500 °C). The MoS2 film had an indirect bandgap of 1.36 eV and a high Hall mobility compared with the as-deposited sputtered MoS2 film.

  8. Suppression of thermally activated carrier transport in atomically thin MoS2 on crystalline hexagonal boron nitride substrates

    NASA Astrophysics Data System (ADS)

    Chan, Mei Yin; Komatsu, Katsuyoshi; Li, Song-Lin; Xu, Yong; Darmawan, Peter; Kuramochi, Hiromi; Nakaharai, Shu; Aparecido-Ferreira, Alex; Watanabe, Kenji; Taniguchi, Takashi; Tsukagoshi, Kazuhito

    2013-09-01

    We present the temperature-dependent carrier mobility of atomically thin MoS2 field-effect transistors on crystalline hexagonal boron nitride (h-BN) and SiO2 substrates. Our results reveal distinct weak temperature dependence of the MoS2 devices on h-BN substrates. The room temperature mobility enhancement and reduced interface trap density of the single and bilayer MoS2 devices on h-BN substrates further indicate that reducing substrate traps is crucial for enhancing the mobility in atomically thin MoS2 devices.We present the temperature-dependent carrier mobility of atomically thin MoS2 field-effect transistors on crystalline hexagonal boron nitride (h-BN) and SiO2 substrates. Our results reveal distinct weak temperature dependence of the MoS2 devices on h-BN substrates. The room temperature mobility enhancement and reduced interface trap density of the single and bilayer MoS2 devices on h-BN substrates further indicate that reducing substrate traps is crucial for enhancing the mobility in atomically thin MoS2 devices. Electronic supplementary information (ESI) available. See DOI: 10.1039/c3nr03220e

  9. Transistor Effect in Improperly Connected Transistors.

    ERIC Educational Resources Information Center

    Luzader, Stephen; Sanchez-Velasco, Eduardo

    1996-01-01

    Discusses the differences between the standard representation and a realistic representation of a transistor. Presents an experiment that helps clarify the explanation of the transistor effect and shows why transistors should be connected properly. (JRH)

  10. Management Observation System (MOS)

    SciTech Connect

    Michael Baker; Robert Bryant; Teresa Childs

    2006-01-01

    The Management Observation System (MOS) was developed at Oak Ridge National Laboratory (ORNL) to improve the overall safety of the Laboratory. The MOS provides a tool to document management observations, records time spent in the field conducting observations, and the results of those observations. It also documents if there are lessons learned from a particular observation or if follow-up actions are needed to correct issues or deficiencies identified. Management has found this a very useful tool to use as a proactive approach to identifying and/or correcting potential problems before they become safety related issues.

  11. Observing the semiconducting band-gap alignment of MoS2 layers of different atomic thicknesses using a MoS2/SiO2/Si heterojunction tunnel diode

    NASA Astrophysics Data System (ADS)

    Nishiguchi, Katsuhiko; Castellanos-Gomez, Andres; Yamaguchi, Hiroshi; Fujiwara, Akira; van der Zant, Herre S. J.; Steele, Gary A.

    2015-08-01

    We demonstrate a tunnel diode composed of a vertical MoS2/SiO2/Si heterostructure. A MoS2 flake consisting four areas of different thicknesses functions as a gate terminal of a silicon field-effect transistor. A thin gate oxide allows tunneling current to flow between the n-type MoS2 layers and p-type Si channel. The tunneling-current characteristics show multiple negative differential resistance features, which we interpret as an indication of different conduction-band alignments of the MoS2 layers of different thicknesses. The presented tunnel device can be also used as a hybrid-heterostructure device combining the advantages of two-dimensional materials with those of silicon transistors.

  12. Strain and structure heterogeneity in MoS2 atomic layers grown by chemical vapour deposition

    DOE PAGESBeta

    Liu, Zheng; Amani, Matin; Najmaei, Sina; Xu, Quan; Zou, Xiaolong; Zhou, Wu; Yu, Ting; Qiu, Caiyu; Birdwell, A. Glen; Crowne, Frank J.; et al

    2014-11-18

    Monolayer molybdenum disulfide (MoS2) has attracted tremendous attention due to its promising applications in high-performance field-effect transistors, phototransistors, spintronic devices, and nonlinear optics. The enhanced photoluminescence effect in monolayer MoS2 was discovered and, as a strong tool, was employed for strain and defect analysis in MoS2. Recently, large-size monolayer MoS2 has been produced by chemical vapor deposition but has not yet been fully explored. Here we systematically characterize chemical vapor deposition grown MoS2 by PL spectroscopy and mapping, and demonstrate non-uniform strain in single-crystalline monolayer MoS2 and strain-induced band gap engineering. We also evaluate the effective strain transferred from polymermore » substrates to MoS2 by three-dimensional finite element analysis. In addition, our work demonstrates that PL mapping can be used as a non-contact approach for quick identification of grain boundaries in MoS2.« less

  13. Polarization-dependent photocurrent in MoS2 phototransistor

    NASA Astrophysics Data System (ADS)

    Li, Jiu; Yu, Wentao; Chu, Saisai; Yang, Hong; Shi, Kebin; Gong, Qihuang

    2015-03-01

    Monolayer or few-layer molybdenum disulfide (MoS2) has attracted increasing interests in studying light-induced electronic effect due to its prominent photo-responsivity at visible spectral range, fast photo-switching rate and high channel mobility. However, the atomically thin layers make the interaction between light and matter much weaker than that in bulk state, hampering its application in two-dimensional material optoelectronics. One of recent efforts was to utilize resonantly enhanced localized surface plasmon for boosting light-matter interaction in MoS2 thin layer phototransistor. Randomly deposited metallic nano-particles were previously reported to modify surface of a back-gated MoS2 transistor for increasing light absorption cross-section of the phototransistor. Wavelength-dependent photocurrent enhancement was observed. In this paper, we report on a back-gated multilayer MoS2 field-effect-transistor (FET), whose surface is decorated with oriented gold nanobar array, of which the size of a single nanobar is 60nm:60nm:120nm. With these oriented nanostructures, photocurrent of the MoS2 FET could be successfully manipulated by a linear polarized incident 633nm laser, which fell into the resonance band of nanobar structure. We find that the drain-source current follows cos2θ relationship with respect to the incident polarization angle. We attribute the polarization modulation effect to the localized enhancement nature of gold nanobar layer, where the plasmon enhancement occurs only when the polarization of incident laser parallels to the longitudinal axis of nanobars and when the incident wavelength matches the resonance absorption of nanobars simultaneously. Our results indicate a promising application of polarization-dependent plasmonic manipulation in two-dimension semiconductor materials and devices.

  14. Nonvolatile memory cells based on MoS2/graphene heterostructures.

    PubMed

    Bertolazzi, Simone; Krasnozhon, Daria; Kis, Andras

    2013-04-23

    Memory cells are an important building block of digital electronics. We combine here the unique electronic properties of semiconducting monolayer MoS2 with the high conductivity of graphene to build a 2D heterostructure capable of information storage. MoS2 acts as a channel in an intimate contact with graphene electrodes in a field-effect transistor geometry. Our prototypical all-2D transistor is further integrated with a multilayer graphene charge trapping layer into a device that can be operated as a nonvolatile memory cell. Because of its band gap and 2D nature, monolayer MoS2 is highly sensitive to the presence of charges in the charge trapping layer, resulting in a factor of 10(4) difference between memory program and erase states. The two-dimensional nature of both the contact and the channel can be harnessed for the fabrication of flexible nanoelectronic devices with large-scale integration. PMID:23510133

  15. Single-layer MoS2 electronics.

    PubMed

    Lembke, Dominik; Bertolazzi, Simone; Kis, Andras

    2015-01-20

    CONSPECTUS: Atomic crystals of two-dimensional materials consisting of single sheets extracted from layered materials are gaining increasing attention. The most well-known material from this group is graphene, a single layer of graphite that can be extracted from the bulk material or grown on a suitable substrate. Its discovery has given rise to intense research effort culminating in the 2010 Nobel Prize in physics awarded to Andre Geim and Konstantin Novoselov. Graphene however represents only the proverbial tip of the iceberg, and increasing attention of researchers is now turning towards the veritable zoo of so-called "other 2D materials". They have properties complementary to graphene, which in its pristine form lacks a bandgap: MoS2, for example, is a semiconductor, while NbSe2 is a superconductor. They could hold the key to important practical applications and new scientific discoveries in the two-dimensional limit. This family of materials has been studied since the 1960s, but most of the research focused on their tribological applications: MoS2 is best known today as a high-performance dry lubricant for ultrahigh-vacuum applications and in car engines. The realization that single layers of MoS2 and related materials could also be used in functional electronic devices where they could offer advantages compared with silicon or graphene created a renewed interest in these materials. MoS2 is currently gaining the most attention because the material is easily available in the form of a mineral, molybdenite, but other 2D transition metal dichalcogenide (TMD) semiconductors are expected to have qualitatively similar properties. In this Account, we describe recent progress in the area of single-layer MoS2-based devices for electronic circuits. We will start with MoS2 transistors, which showed for the first time that devices based on MoS2 and related TMDs could have electrical properties on the same level as other, more established semiconducting materials. This

  16. Large-area MoS2 grown using H2S as the sulphur source

    NASA Astrophysics Data System (ADS)

    Dumcenco, Dumitru; Ovchinnikov, Dmitry; Lopez Sanchez, Oriol; Gillet, Philippe; Alexander, Duncan T. L.; Lazar, Sorin; Radenovic, Aleksandra; Kis, Andras

    2015-12-01

    We report on the growth of molybdenum disulphide (MoS2) using H2S as a gas-phase sulfur precursor that allows controlling the domain growth direction of domains in both vertical (perpendicular to the substrate plane) and horizontal (within the substrate plane), depending on the H2S:H2 ratio in the reaction gas mixture and temperature at which they are introduced during growth. Optical and atomic force microscopy measurements on horizontal MoS2 demonstrate the formation of monolayer triangular-shape domains that merge into a continuous film. Scanning transmission electron microscopy of monolayer MoS2 shows a regular atomic structure with a hexagonal symmetry. Raman and photoluminescence spectra confirm the monolayer thickness of the material. Field-effect transistors fabricated on MoS2 domains that are transferred onto Si/SiO2 substrates show a mobility similar to previously reported exfoliated and chemical vapor deposition-grown materials.

  17. Chemical doping of MoS2 multilayer by p-toluene sulfonic acid

    NASA Astrophysics Data System (ADS)

    Andleeb, Shaista; Singh, Arun Kumar; Eom, Jonghwa

    2015-06-01

    We report the tailoring of the electrical properties of mechanically exfoliated multilayer (ML) molybdenum disulfide (MoS2) by chemical doping. Electrical charge transport and Raman spectroscopy measurements revealed that the p-toluene sulfonic acid (PTSA) imposes n-doping in ML MoS2. The shift of threshold voltage for ML MoS2 transistor was analyzed as a function of reaction time. The threshold voltage shifted toward more negative gate voltages with increasing reaction time, which indicates an n-type doping effect. The shift of the Raman peak positions was also analyzed as a function of reaction time. PTSA treatment improved the field-effect mobility by a factor of ~4 without degrading the electrical characteristics of MoS2 devices.

  18. Large-Area Epitaxial Monolayer MoS2

    PubMed Central

    2015-01-01

    Two-dimensional semiconductors such as MoS2 are an emerging material family with wide-ranging potential applications in electronics, optoelectronics, and energy harvesting. Large-area growth methods are needed to open the way to applications. Control over lattice orientation during growth remains a challenge. This is needed to minimize or even avoid the formation of grain boundaries, detrimental to electrical, optical, and mechanical properties of MoS2 and other 2D semiconductors. Here, we report on the growth of high-quality monolayer MoS2 with control over lattice orientation. We show that the monolayer film is composed of coalescing single islands with limited numbers of lattice orientation due to an epitaxial growth mechanism. Optical absorbance spectra acquired over large areas show significant absorbance in the high-energy part of the spectrum, indicating that MoS2 could also be interesting for harvesting this region of the solar spectrum and fabrication of UV-sensitive photodetectors. Even though the interaction between the growth substrate and MoS2 is strong enough to induce lattice alignment via van der Waals interaction, we can easily transfer the grown material and fabricate devices. Local potential mapping along channels in field-effect transistors shows that the single-crystal MoS2 grains in our film are well connected, with interfaces that do not degrade the electrical conductivity. This is also confirmed by the relatively large and length-independent mobility in devices with a channel length reaching 80 μm. PMID:25843548

  19. Large-Area Epitaxial Monolayer MoS2.

    PubMed

    Dumcenco, Dumitru; Ovchinnikov, Dmitry; Marinov, Kolyo; Lazić, Predrag; Gibertini, Marco; Marzari, Nicola; Lopez Sanchez, Oriol; Kung, Yen-Cheng; Krasnozhon, Daria; Chen, Ming-Wei; Bertolazzi, Simone; Gillet, Philippe; Fontcuberta i Morral, Anna; Radenovic, Aleksandra; Kis, Andras

    2015-04-28

    Two-dimensional semiconductors such as MoS2 are an emerging material family with wide-ranging potential applications in electronics, optoelectronics, and energy harvesting. Large-area growth methods are needed to open the way to applications. Control over lattice orientation during growth remains a challenge. This is needed to minimize or even avoid the formation of grain boundaries, detrimental to electrical, optical, and mechanical properties of MoS2 and other 2D semiconductors. Here, we report on the growth of high-quality monolayer MoS2 with control over lattice orientation. We show that the monolayer film is composed of coalescing single islands with limited numbers of lattice orientation due to an epitaxial growth mechanism. Optical absorbance spectra acquired over large areas show significant absorbance in the high-energy part of the spectrum, indicating that MoS2 could also be interesting for harvesting this region of the solar spectrum and fabrication of UV-sensitive photodetectors. Even though the interaction between the growth substrate and MoS2 is strong enough to induce lattice alignment via van der Waals interaction, we can easily transfer the grown material and fabricate devices. Local potential mapping along channels in field-effect transistors shows that the single-crystal MoS2 grains in our film are well connected, with interfaces that do not degrade the electrical conductivity. This is also confirmed by the relatively large and length-independent mobility in devices with a channel length reaching 80 μm. PMID:25843548

  20. Experimental investigation of a double-diffused MOS structure

    NASA Technical Reports Server (NTRS)

    Lin, H. C.; Halsor, J. L.

    1976-01-01

    Self-aligned polysilicon gate technology was applied to double-diffused MOS (DMOS) construction in a manner that retains processing simplicity and effectively eliminates parasitic overlap capacitance because of the self-aligning feature. Depletion mode load devices with the same dimensions as the DMOS transistors were integrated. The ratioless feature results in smaller dimension load devices, allowing for higher density integration with no increase in the processing complexity of standard MOS technology. A number of inverters connected as ring oscillators were used as a vehicle to test the performance and to verify the anticipated benefits. The propagation time-power dissipation product and process related parameters were measured and evaluated. This report includes (1) details of the process; (2) test data and design details for the DMOS transistor, the load device, the inverter, the ring oscillator, and a shift register with a novel tapered geometry for the output stages; and (3) an analytical treatment of the effect of the distributed silicon gate resistance and capacitance on the speed of DMOS transistors.

  1. Switching Transistor

    NASA Technical Reports Server (NTRS)

    1981-01-01

    Westinghouse Electric Corporation's D60T transistors are used primarily as switching devices for controlling high power in electrical circuits. It enables reduction in the number and size of circuit components and promotes more efficient use of energy. Wide range of application from a popcorn popper to a radio frequency generator for solar cell production.

  2. Thermal Conductance at the 2D MoS2-hexagonal Boron Nitride Interface

    NASA Astrophysics Data System (ADS)

    Liu, Yi; Hippalgaonkar, Kedar; Ong, Zhun Yong; Thong, John Tl; Qiu, Chengwei

    In recent years, a number of 2D heterostructure devices have emerged, including graphene/hexagonal boron nitride (h-BN), graphene/MoS2 and MoS2/ h-BN. Among them, MoS2/ h-BN field-effect transistors with MoS2 channels and h-BN dielectric have been reported to have higher carrier mobility and reduced hysteresis compared to MoS2 on SiO2. Despite relatively high in-plane thermal conductivity of MoS2 and h-BN, heat dissipation from these 2D devices is mainly limited by heat transfer in the vertical direction. Consequently, their operating temperatures are strongly influenced by the interface thermal conductance. In this work, we demonstrate the measurement of interface thermal conductance between MoS2 and h-BN. This is realized by electrically heating MoS2 and monitoring their temperatures through Raman spectroscopy. The obtained interface thermal conductance between MoS2 and h-BN is 1.77 MW/m2K, smaller than the reported value for the graphene/ h-BN interface, due to the weak coupling of phonon modes between MoS2 and h-BN based on our NEGF calculation. The low interface thermal conductance value suggests this interface is not favorable for heat dissipation, and should be considered carefully for the design of electronic and optoelectronic devices based on MoS2/ h-BN heterostructures.

  3. Optoelectrical Molybdenum Disulfide (MoS2)--Ferroelectric Memories.

    PubMed

    Lipatov, Alexey; Sharma, Pankaj; Gruverman, Alexei; Sinitskii, Alexander

    2015-08-25

    In this study, we fabricated and tested electronic and memory properties of field-effect transistors (FETs) based on monolayer or few-layer molybdenum disulfide (MoS2) on a lead zirconium titanate (Pb(Zr,Ti)O3, PZT) substrate that was used as a gate dielectric. MoS2-PZT FETs exhibit a large hysteresis of electronic transport with high ON/OFF ratios. We demonstrate that the interplay of polarization and interfacial phenomena strongly affects the electronic behavior and memory characteristics of MoS2-PZT FETs. We further demonstrate that MoS2-PZT memories have a number of advantages and unique features compared to their graphene-based counterparts as well as commercial ferroelectric random-access memories (FeRAMs), such as nondestructive data readout, low operation voltage, wide memory window and the possibility to write and erase them both electrically and optically. This dual optoelectrical operation of these memories can simplify the device architecture and offer additional practical functionalities, such as an instant optical erase of large data arrays that is unavailable for many conventional memories. PMID:26222209

  4. Extraordinary attributes of 2-dimensional MoS2 nanosheets

    NASA Astrophysics Data System (ADS)

    Rao, C. N. R.; Maitra, Urmimala; Waghmare, Umesh V.

    2014-08-01

    The discovery of the amazing properties of graphene has stimulated exploration of single- and few-layer structures of layered inorganic materials. Of all the inorganic 2D nanosheet structures, those of MoS2 have attracted great attention because of their novel properties such as the presence of a direct bandgap, good field-effect transistor characteristics, large spin-orbit splitting, intense photoluminescence, catalytic properties, magnetism, superconductivity, ferroelectricity and several other properties with potential applications in electronics, optoelectronics, energy devices and spintronics. MoS2 nanosheets have been used in lithium batteries, supercapacitors and to generate hydrogen. Highlights of the impressive properties of MoS2 nanosheets, along with their structural and spectroscopic features are presented in this Letter. MoS2 typifies the family of metal dichalcogenides such as MoSe2 and WS2 and there is much to be done on nanosheets of these materials. Linus Pauling would have been pleased to see how molybdenite whose structure he studied in 1923 has become so important today.

  5. Shielded silicon gate complementary MOS integrated circuit.

    NASA Technical Reports Server (NTRS)

    Lin, H. C.; Halsor, J. L.; Hayes, P. J.

    1972-01-01

    An electrostatic shield for complementary MOS integrated circuits was developed to minimize the adverse effects of stray electric fields created by the potentials in the metal interconnections. The process is compatible with silicon gate technology. N-doped polycrystalline silicon was used for all the gates and the shield. The effectiveness of the shield was demonstrated by constructing a special field plate over certain transistors. The threshold voltages obtained on an oriented silicon substrate ranged from 1.5 to 3 V for either channel. Integrated inverters performed satisfactorily from 3 to 15 V, limited at the low end by the threshold voltages and at the high end by the drain breakdown voltage of the n-channel transistors. The stability of the new structure with an n-doped silicon gate as measured by the shift in C-V curve under 200 C plus or minus 20 V temperature-bias conditions was better than conventional aluminum gate or p-doped silicon gate devices, presumably due to the doping of gate oxide with phosphorous.

  6. Abnormal electrical characteristics of multi-layered MoS2 FETs attributed to bulk traps

    NASA Astrophysics Data System (ADS)

    Kim, Choong-Ki; Yu, Chan Hak; Hur, Jae; Bae, Hagyoul; Jeon, Seung-Bae; Park, Hamin; Kim, Yong Min; Choi, Kyung Cheol; Choi, Yang-Kyu; Choi, Sung-Yool

    2016-03-01

    Multiple layers of MoS2 are used as channel materials in a type of field-effect transistor (FET). It was found that the hysteresis in transfer curves and low-frequency noise (LFN) characteristics are varied by the number of layers in MoS2 due to the different influences of bulk traps. The LFN characteristics of a FET composed of a ‘bi-layer’ MoS2 channel, which was passivated with an atomic-layer-deposited (ALD) Al2O3 layer, follow the conventional carrier number fluctuation (CNF) model. However, FETs consisting of multi-layered MoS2 channels (4, 7, 9, and 18 layers) show abnormal LFN characteristics, which substantially deviate from well-established 1/f noise models such as the CNF and Hooge’s mobility fluctuation models. The bulk traps inside the MoS2 layers are the origin of the abnormal LFN characteristics and the large hysteresis of FETs with multi-layered MoS2 is due to its randomly embedded bulk traps. Secondary ion mass spectrometry (SIMS) confirms the existence of oxygen species that induce the electrical bulk trap in the MoS2 layers.

  7. High-performance molybdenum disulfide field-effect transistors with spin tunnel contacts.

    PubMed

    Dankert, André; Langouche, Lennart; Kamalakar, Mutta Venkata; Dash, Saroj Prasad

    2014-01-28

    Molybdenum disulfide has recently emerged as a promising two-dimensional semiconducting material for nanoelectronic, optoelectronic, and spintronic applications. Here, we investigate the field-effect transistor behavior of MoS2 with ferromagnetic contacts to explore its potential for spintronics. In such devices, we elucidate that the presence of a large Schottky barrier resistance at the MoS2/ferromagnet interface is a major obstacle for the electrical spin injection and detection. We circumvent this problem by a reduction in the Schottky barrier height with the introduction of a thin TiO2 tunnel barrier between the ferromagnet and MoS2. This results in an enhancement of the transistor on-state current by 2 orders of magnitude and an increment in the field-effect mobility by a factor of 6. Our magnetoresistance calculation reveals that such integration of ferromagnetic tunnel contacts opens up the possibilities for MoS2-based spintronic devices. PMID:24377305

  8. Ferroelectric Field-Effect Transistor Differential Amplifier Circuit Analysis

    NASA Technical Reports Server (NTRS)

    Phillips, Thomas A.; MacLeod, Todd C.; Ho, Fat D.

    2008-01-01

    There has been considerable research investigating the Ferroelectric Field-Effect Transistor (FeFET) in memory circuits. However, very little research has been performed in applying the FeFET to analog circuits. This paper investigates the use of FeFETs in a common analog circuit, the differential amplifier. The two input Metal-Oxide-Semiconductor (MOS) transistors in a general MOS differential amplifier circuit are replaced with FeFETs. Resistors are used in place of the other three MOS transistors. The FeFET model used in the analysis has been previously reported and was based on experimental device data. Because of the FeFET hysteresis, the FeFET differential amplifier has four different operating modes depending on whether the FeFETs are positively or negatively polarized. The FeFET differential amplifier operation in the different modes was analyzed by calculating the amplifier voltage transfer and gain characteristics shown in figures 2 through 5. Comparisons were made between the FeFET differential amplifier and the standard MOS differential amplifier. Possible applications and benefits of the FeFET differential amplifier are discussed.

  9. Few-layer molybdenum disulfide transistors and circuits for high-speed flexible electronics

    PubMed Central

    Cheng, Rui; Jiang, Shan; Chen, Yu; Liu, Yuan; Weiss, Nathan; Cheng, Hung-Chieh; Wu, Hao; Huang, Yu; Duan, Xiangfeng

    2014-01-01

    Two-dimensional layered materials, such as molybdenum disulfide, are emerging as an exciting material system for future electronics due to their unique electronic properties and atomically thin geometry. Here we report a systematic investigation of MoS2 transistors with optimized contact and device geometry, to achieve self-aligned devices with performance including an intrinsic gain over 30, an intrinsic cut-off frequency fT up to 42 GHz and a maximum oscillation frequency fMAX up to 50 GHz, exceeding the reported values for MoS2 transistors to date (fT ~ 0.9 GHz, fMAX ~ 1 GHz). Our results show that logic inverters or radio frequency amplifiers can be formed by integrating multiple MoS2 transistors on quartz or flexible substrates with voltage gain in the gigahertz regime. This study demonstrates the potential of two-dimensional layered semiconductors for high-speed flexible electronics. PMID:25295573

  10. Electron-hole transport and photovoltaic effect in gated MoS2 Schottky junctions

    NASA Astrophysics Data System (ADS)

    Fontana, Marcio; Deppe, Tristan; Boyd, Anthony K.; Rinzan, Mohamed; Liu, Amy Y.; Paranjape, Makarand; Barbara, Paola

    2013-04-01

    Semiconducting molybdenum disulfphide has emerged as an attractive material for novel nanoscale optoelectronic devices due to its reduced dimensionality and large direct bandgap. Since optoelectronic devices require electron-hole generation/recombination, it is important to be able to fabricate ambipolar transistors to investigate charge transport both in the conduction band and in the valence band. Although n-type transistor operation for single-layer and few-layer MoS2 with gold source and drain contacts was recently demonstrated, transport in the valence band has been elusive for solid-state devices. Here we show that a multi-layer MoS2 channel can be hole-doped by palladium contacts, yielding MoS2 p-type transistors. When two different materials are used for the source and drain contacts, for example hole-doping Pd and electron-doping Au, the Schottky junctions formed at the MoS2 contacts produce a clear photovoltaic effect.

  11. Electron-hole transport and photovoltaic effect in gated MoS2 Schottky junctions

    NASA Astrophysics Data System (ADS)

    Boyd, Anthony; Fontana, Marcio; Deppe, Tristan; Rinzan, Mohamed; Liu, Amy; Paranjape, Makarand; Barbara, Paola

    2013-03-01

    Atomically thin molybdenum disulfide has emerged as an attractive material for novel nanoscale optoelectronic devices due to its reduced dimensionality and large direct bandgap. Since optoelectronic devices require electron-hole generation/recombination, it is important to be able to fabricate ambipolar transistors to investigate charge transport both in the conduction band and in the valence band. Although n-type transistor operation for single-layer and few-layer MoS2 with gold source and drain contacts was recently demonstrated..., transport in the valence band has been elusive for solid-state devices. Here we show that a multi-layer MoS2 channel can be hole-doped by palladium contacts, yielding MoS2 p-type transistors. When two different materials are used for the source and drain contacts, for example hole-doping Pd and electron-doping Au, the Schottky junctions formed at the MoS2 contacts produce a clear photovoltaic effect. Work Funded by NSF, DMR 1008242.

  12. Chemisorption-induced n-doping of MoS2 by oxygen

    NASA Astrophysics Data System (ADS)

    Qi, Long; Wang, Ying; Shen, Lei; Wu, Yihong

    2016-02-01

    Both chemisorption and physisorption affect the electronic properties of two-dimensional materials, such as MoS2, but it remains a challenge to probe their respective roles experimentally. Through repeated in-situ electrical measurements of few-layer MoS2 field-effect transistors in an ultrahigh vacuum system with well-controlled oxygen partial pressure (6 × 10-8 mbar-3 × 10-7 mbar), we were able to study the effect of chemisorption on surface defects separately from physically adsorbed oxygen molecules. It is found that chemisorption of oxygen results in n-doping in the channel but negligible effect on mobility and on/off ratio of the MoS2 transistors. These results are in disagreement with the previous reports on p-doping and degradation of the device's performance when both chemisorption and physisorption are present. Through the analysis of adsorption-desorption kinetics and the first-principles calculations of electronic properties, we show that the experimentally observed n-doping effect originates from dissociative adsorption of oxygen at the surface defects of MoS2, which lowers the conduction band edge locally and makes the MoS2 channel more n-type-like as compared to the as-fabricated devices.

  13. Superconducting transistor

    DOEpatents

    Gray, Kenneth E.

    1979-01-01

    A superconducting transistor is formed by disposing three thin films of superconducting material in a planar parallel arrangement and insulating the films from each other by layers of insulating oxides to form two tunnel junctions. One junction is biased above twice the superconducting energy gap and the other is biased at less than twice the superconducting energy gap. Injection of quasiparticles into the center film by one junction provides a current gain in the second junction.

  14. High frequency integrated MOS filters

    NASA Technical Reports Server (NTRS)

    Peterson, C.

    1990-01-01

    Several techniques exist for implementing integrated MOS filters. These techniques fit into the general categories of sampled and tuned continuous-time filters. Advantages and limitations of each approach are discussed. This paper focuses primarily on the high frequency capabilities of MOS integrated filters.

  15. Large-Area Monolayer MoS2 for Flexible Low-Power RF Nanoelectronics in the GHz Regime.

    PubMed

    Chang, Hsiao-Yu; Yogeesh, Maruthi Nagavalli; Ghosh, Rudresh; Rai, Amritesh; Sanne, Atresh; Yang, Shixuan; Lu, Nanshu; Banerjee, Sanjay Kumar; Akinwande, Deji

    2016-03-01

    Flexible synthesized MoS2 transistors are advanced to perform at GHz speeds. An intrinsic cutoff frequency of 5.6 GHz is achieved and analog circuits are realized. Devices are mechanically robust for 10 000 bending cycles. PMID:26707841

  16. Theoretical and experimental investigation of vacancy-based doping of monolayer MoS2 on oxide

    NASA Astrophysics Data System (ADS)

    Valsaraj, Amithraj; Chang, Jiwon; Rai, Amritesh; Register, Leonard F.; Banerjee, Sanjay K.

    2015-12-01

    Monolayer (ML) transition metal dichalcogenides are novel, gapped two-dimensional materials with unique electrical and optical properties. Toward device applications, we consider MoS2 layers on dielectrics, in particular in this work, the effect of vacancies on the electronic structure. In density-functional based simulations, we consider the effects of near-interface O vacancies in the oxide slab, and Mo or S vacancies in the MoS2 layer. Band structures and atom-projected densities of states for each system and with differing oxide terminations were calculated, as well as those for the defect-free MoS2-dielectrics system and for isolated dielectric layers for reference. Among our results, we find that with O vacancies, both the Hf-terminated HfO2-MoS2 system, and the O-terminated and H-passivated Al2O3-MoS2 systems appear metallic due to doping of the oxide slab followed by electron transfer into the MoS2, in manner analogous to modulation doping. The n-type doping of ML MoS2 by high-k oxides with oxygen vacancies then is experimentally demonstrated by electrically and spectroscopically characterizing back-gated ML MoS2 field effect transistors encapsulated by oxygen deficient alumina and hafnia.

  17. Direct growth of single- and few-layer MoS2 on h-BN by CVD method

    NASA Astrophysics Data System (ADS)

    Yan, Aiming; Velasco, Jairo, Jr.; Kahn, Salman; Watanabe, Kenji; Taniguchi, Takashi; Wang, Feng; Crommie, Michael; Zettl, Alex

    As a promising candidate for the next-generation electronics, large-scale single- and few-layer molybdenum disulfide (MoS2) grown by CVD method is an important advancement towards technological implementation of this material. However, the choice of substrate can significantly affect the performance of MoS2 based devices. An attractive insulating substrate or mate for MoS2 (and related materials such as graphene) is hexagonal boron nitride (h-BN). Stacked heterostructures of MoS2 and h-BN have been produced by manual transfer methods, but a more efficient and scalable assembly method is needed. Here we demonstrate the direct growth of single- and few-layer MoS2 on h-BN by chemical vapor deposition (CVD) method. The growth mechanisms for single- and few-layer samples are found to be distinct, and for single-layer samples low relative rotation angles (<5°) between the MoS2 and h-BN lattices prevail. In addition, MoS2 directly grown on h-BN maintains its intrinsic 1.89 eV bandgap. Our CVD synthesis method presents a viable path towards high-quality MoS2 based field effect transistors in a controllable and scalable fashion. Acknowledgement: the U.S. Department of Energy under Contract DE-AC02-05CH11231; NSF Grant DMR-1206512.

  18. High efficiency DC-DC converter using GaN transistors

    NASA Astrophysics Data System (ADS)

    Tómaş, Cosmin-Andrei; Grecu, Cristian; Pantazicǎ, Mihaela; Marghescu, Ion

    2015-02-01

    The paper presents a new high-efficiency power switching supply using the Gallium Nitride (GaN) technology. There are compared two solutions, the first using standard MOS transistors and the second using the new GaN transistor. The actual green technologies for obtaining the maximum energy and minimum losses have pushed the semiconductor industry into a continuous research regarding high power and high frequency devices, having uses in both digital communications and switching power supplies.

  19. Characteristics of a Field-Effect Transistor Fabricated with Electropolymerized Thin Film

    NASA Astrophysics Data System (ADS)

    Oyama, Noboru; Yoshimura, Fumihiro; Ohsaka, Takeo; Koezuka, Hiroshi; Ando, Torahiko

    1988-03-01

    The preparation and characteristics of the solid-state field-effect transistor (FET) based on poly(p,p'-biphenol)(PBP) thin film prepared by electropolymerization of p,p'-biphenol are presented. The PBP-based FET displayed excellent drain current (ID)-drain voltage (VD) characteristics for various gate voltages. The ID-VD characteristics were analyzed as in a conventional MOS transistor.

  20. Weak localization and low temperature transport in MoS2 flakes

    NASA Astrophysics Data System (ADS)

    Neal, Adam T.; Liu, Han; Du, Yuchen; Ye, Peide

    2013-03-01

    With the recent identification of the indirect to direct bandgap transition for monolayer MoS2 and the use of MoS2 in field-effect transistors, this material has attracted recent interest in the physics and nanotechnology communities. We report studies of transport in MoS2 at low temperature from 1K up to 70K, characterized by Hall mobility and weak localization. We find that the mobility at T =400mK in this few-layer MoS2 flake varies from 50cm2/Vs to 300cm2/Vs as electron density varies from 6x1012 cm-2 to 1.2x1013 cm-2 via the back gate bias. Additionally, we find that the mobility decreases with increasing temperature as a power law with a characteristic exponent of 1.6 at a carrier concentration of 1.2x1013 cm-2. Magneto-transport measurements reveal weak localization in this MoS2 sample up to temperatures as high as 10K. The phase coherence length in MoS2 is estimated to be about 40nm at 1K for a carrier concentration of 1.2x1013 cm-2.

  1. Synthesis and sensor applications of MoS2-based nanocomposites

    NASA Astrophysics Data System (ADS)

    Zhang, Wensi; Zhang, Panpan; Su, Zhiqiang; Wei, Gang

    2015-11-01

    Molybdenum disulfide (MoS2) is a typical layered transition-metal dichalcogenide material, which has aroused a great deal of interest in the past few years. Recently, more and more attention has been focused on the synthesis and applications of MoS2-based nanocomposites. In this review, we aimed to present a wider view of the synthesis of various MoS2-based nanocomposites for sensor and biosensor applications. We highlighted the potential methods like self-assembly, hydrothermal reaction, chemical vapour deposition, electrospinning, as well as microwave and laser beam treatments for the successful preparation of MoS2-based nanocomposites. On the other hand, three representative types of detection devices fabricated by the MoS2-based nanocomposites, field-effect transistor, optical, and electrochemical sensors, were introduced in detail and discussed fully. The relationships between the sensing performances and the special nanostructures within the MoS2-based nanocomposites were presented and discussed.

  2. Synthesis and sensor applications of MoS2-based nanocomposites.

    PubMed

    Zhang, Wensi; Zhang, Panpan; Su, Zhiqiang; Wei, Gang

    2015-11-28

    Molybdenum disulfide (MoS2) is a typical layered transition-metal dichalcogenide material, which has aroused a great deal of interest in the past few years. Recently, more and more attention has been focused on the synthesis and applications of MoS2-based nanocomposites. In this review, we aimed to present a wider view of the synthesis of various MoS2-based nanocomposites for sensor and biosensor applications. We highlighted the potential methods like self-assembly, hydrothermal reaction, chemical vapour deposition, electrospinning, as well as microwave and laser beam treatments for the successful preparation of MoS2-based nanocomposites. On the other hand, three representative types of detection devices fabricated by the MoS2-based nanocomposites, field-effect transistor, optical, and electrochemical sensors, were introduced in detail and discussed fully. The relationships between the sensing performances and the special nanostructures within the MoS2-based nanocomposites were presented and discussed. PMID:26503462

  3. Tightly bound trions in monolayer MoS2

    NASA Astrophysics Data System (ADS)

    Mak, Kin Fai; He, Keliang; Lee, Changgu; Lee, Gwan Hyoung; Hone, James; Heinz, Tony F.; Shan, Jie

    2013-03-01

    Two-dimensional (2D) atomic crystals, such as graphene and transition-metal dichalcogenides, have emerged as a new class of materials with remarkable physical properties. In contrast to graphene, monolayer MoS2 is a non-centrosymmetric material with a direct energy gap. Strong photoluminescence, a current on/off ratio exceeding 108 in field-effect transistors, and efficient valley and spin control by optical helicity have recently been demonstrated in this material. Here we report the spectroscopic identification in a monolayer MoS2 field-effect transistor of tightly bound negative trions, a quasiparticle composed of two electrons and a hole. These quasiparticles, which can be optically created with valley and spin polarized holes, have no analogue in conventional semiconductors. They also possess a large binding energy (~ 20 meV), rendering them significant even at room temperature. Our results open up possibilities both for fundamental studies of many-body interactions and for optoelectronic and valleytronic applications in 2D atomic crystals.

  4. Band Structure and Effective Mass in Monolayer MoS2.

    PubMed

    Wu, Ming-Ting; Fan, Jun-Wei; Chen, Kuan-Ting; Chang, Shu-Tong; Lin, Chung-Yi

    2015-11-01

    Monolayer transition-metal dichalcogenide is a very promising two-dimensional material for future transistor technology. Monolayer molybdenum disulfide (MoS2), owing to the unique electronic properties of its atomically thin two-dimensional layered structure, can be made into a high-performance metal-oxide-semiconductor field-effect transistor, or MOSFET. In this work, we focus on band structure and carrier mobility calculations for MoS2. We use the tight-binding method to calculate the band structure, including a consideration of the linear combination of different atomic orbitals, the interaction of neighboring atoms, and spin-orbit coupling for different tight-binding matrices. With information about the band structure, we can obtain the density of states, the effective mass, and other physical quantities. Carrier mobility using the Kubo-Greenwood formula is calculated based on the tight-binding band structure. PMID:26726660

  5. Memristive Phenomena in Polycrystalline Single Layer MoS2

    NASA Astrophysics Data System (ADS)

    Sangwan, Vinod; Jariwala, Deep; Kim, In-Soo; Chen, Kan-Sheng; Marks, Tobin; Lauhon, Lincoln; Hersam, Mark; Hersam Laboratory Team

    Recently, a new class of layered two-dimensional semiconductors has shown promise for various electronic applications. In particular, ultrathin transition metal dichalcogenides (e.g. MoS2) present a host of attractive features such as high carrier mobility and tunable band-gap. However, available growth methods produce polycrystalline films with grain-boundaries and point defects that can be detrimental in conventional electronic devices. In contrast, we have developed unconventional device structures that exploit these defects for useful electronic functions. In particular, we observe grain-boundary mediated memristive phenomena in single layer MoS2 transistors. Memristor current-voltage characteristics depend strongly on the topology of grain-boundaries in MoS2. A grain boundary directly connecting metal electrodes produces thermally assisted switching with dynamic negative differential resistance, whereas a grain boundary bisecting the channel shows non-filamentary soft-switching. In addition, devices with intersecting grain boundaries in the channel show bipolar resistive switching with high on/off ratios up to ~103. Furthermore, the gate electrode in the field-effect geometry can be used to control the absolute resistance of the on and off states. Correlated electrostatic force microscopy, photoluminescence, and Raman microscopy reveal the role of sulfur vacancies in the switching mechanism. This abstract is replacing MAR16-2015-004166 that had exceeded the character limit.

  6. Memristive Phenomena in Polycrystalline Single Layer MoS2

    NASA Astrophysics Data System (ADS)

    Sangwan, Vinod; Jariwala, Deep; Kim, In-Soo; Chen, Kan-Sheng; Marks, Tobin; Lauhon, Lincoln; Hersam, Mark; Hersam Laboratory Team

    Recently, a new class of layered two-dimensional semiconductors has shown promise for various electronic applications. In particular, single layer transition metal dichalcogenides (e.g. MoS2) present a host of attractive features such as high electrical conductivity, tunable band-gap, and strong light-matter interaction. However, available growth methods produce large-area polycrystalline films with grain-boundaries and point defects that can be detrimental in conventional electronic devices. In contrast, we have developed unconventional device structures that exploit these defects for useful electronic functions. In particular, we observe grain-boundary mediated memristive phenomena in single layer MoS2 transistors. Memristor current-voltage characteristics depend strongly on the topology of grain-boundaries in MoS2. A grain boundary directly connecting metal electrodes produces thermally assisted switching with dynamic negative differential resistance, whereas a grain boundary bisecting the channel shows non-filamentary soft-switching. In addition, devices with intersecting grain boundaries in the channel show bipolar resistive switching with high on/off ratios up to ~103. Furthermore, the gate electrode in the field-effect geometry can be used to control the absolute resistance of the on and off states. Complementary electrostatic force microscopy, photoluminescence, and Raman microscopy reveal the role of sulfur vacancies in the switching mechanism.

  7. Electrical Transport Properties of Polymorphic MoS2.

    PubMed

    Kim, Jun Suk; Kim, Jaesu; Zhao, Jiong; Kim, Sungho; Lee, Jin Hee; Jin, Youngjo; Choi, Homin; Moon, Byoung Hee; Bae, Jung Jun; Lee, Young Hee; Lim, Seong Chu

    2016-08-23

    The engineering of polymorphs in two-dimensional layered materials has recently attracted significant interest. Although the semiconducting (2H) and metallic (1T) phases are known to be stable in thin-film MoTe2, semiconducting 2H-MoS2 is locally converted into metallic 1T-MoS2 through chemical lithiation. In this paper, we describe the observation of the 2H, 1T, and 1T' phases coexisting in Li-treated MoS2, which result in unusual transport phenomena. Although multiphase MoS2 shows no transistor-gating response, the channel resistance decreases in proportion to the temperature, similar to the behavior of a typical semiconductor. Transmission electron microscopy images clearly show that the 1T and 1T' phases are randomly distributed and intervened with 2H-MoS2, which is referred to as the 1T and 1T' puddling phenomenon. The resistance curve fits well with 2D-variable range-hopping transport behavior, where electrons hop over 1T domains that are bounded by semiconducting 2H phases. However, near 30 K, electrons hop over charge puddles. The large temperature coefficient of resistance (TCR) of multiphase MoS2, -2.0 × 10(-2) K(-1) at 300 K, allows for efficient IR detection at room temperature by means of the photothermal effect. PMID:27399325

  8. Total Ionizing Dose Effects in MOS Oxides and Devices

    NASA Technical Reports Server (NTRS)

    Oldham, Timothy R.; McLean, F. B.

    2003-01-01

    The development of military and space electronics technology has traditionally been heavily influenced by the commercial semiconductor industry. The development of MOS technology, and particularly CMOS technology, as dominant commercial technologies has occurred entirely within the lifetime of the NSREC. For this reason, it is not surprising that the study of radiation interactions with MOS materials, devices and circuits has been a major theme of this conference for most of its history. The basic radiation problem in a MOS transistor is illustrated. The application of an appropriate gate voltage causes a conducting channel to form between the source and drain, so that current flows when the device is turned on. In Fig. lb, the effect of ionizing radiation is illustrated. Radiation-induced trapped charge has built up in the gate oxide, which causes a shift in the threshold voltage (that is, a change in the voltage which must be applied to turn the device on). If this shift is large enough, the device cannot be turned off, even at zero volts applied, and the device is said to have failed by going depletion mode.

  9. Experimental investigation of a shielded complementary Metal-Oxide Semiconductor (MOS) structure

    NASA Technical Reports Server (NTRS)

    Lin, H. C.; Halsor, J. L.

    1974-01-01

    A shielded integrated complimentary MOS transistor structure is described which is used to prevent field inversion in the region not occupied by the gates and which permits the use of a thinner field oxide, reduces the chip area, and has provision for simplified multilayer connections. The structure is used in the design of a static shift register and results in a 20% reduction in area.

  10. Analysis of the influence of MOS device geometry on predicted SEU cross sections

    SciTech Connect

    Warren, K.; Massengill, L.; Schrimpf, R.; Barnaby, H.

    1999-12-01

    An investigation into the single-event sensitive area geometry of a body-tied-to-source (BTS) SOI nMOS transistor has been performed through a novel simulation technique. Results are presented which demonstrate the influence of spatial variations in charge collection efficiency on the shape of the predicted upset cross section curve. Observations are made on a technique for inferring sensitive area or intra-cell collection efficiencies from cross section data.

  11. Inversion layer MOS solar cells

    NASA Technical Reports Server (NTRS)

    Ho, Fat Duen

    1986-01-01

    Inversion layer (IL) Metal Oxide Semiconductor (MOS) solar cells were fabricated. The fabrication technique and problems are discussed. A plan for modeling IL cells is presented. Future work in this area is addressed.

  12. Hydrogenation-induced atomic stripes on the 2 H -MoS2 surface

    NASA Astrophysics Data System (ADS)

    Han, Sang Wook; Yun, Won Seok; Lee, J. D.; Hwang, Y. H.; Baik, J.; Shin, H. J.; Lee, Wang G.; Park, Young S.; Kim, Kwang S.

    2015-12-01

    We report that the hydrogenation of a single crystal 2 H -MoS2 induces a novel-intermediate phase between 2H and 1T phases on its surface, i.e., the large-area, uniform, robust, and surface array of atomic stripes through the intralayer atomic-plane gliding. The total energy calculations confirm that the hydrogenation-induced atomic stripes are energetically most stable on the MoS2 surface between the semiconducting 2H and metallic 1T phase. Furthermore, the electronic states associated with the hydrogen ions, which is bonded to sulfur anions on both sides of the MoS2 surface layer, appear in the vicinity of the Fermi level (EF) and reduces the band gap. This is promising in developing the monolayer-based field-effect transistor or vanishing the Schottky barrier for practical applications.

  13. Large-area few-layer MoS2 deposited by sputtering

    NASA Astrophysics Data System (ADS)

    Huang, Jyun-Hong; Chen, Hsing-Hung; Liu, Pang-Shiuan; Lu, Li-Syuan; Wu, Chien-Ting; Chou, Cheng-Tung; Lee, Yao-Jen; Li, Lain-Jong; Chang, Wen-Hao; Hou, Tuo-Hung

    2016-06-01

    Direct magnetron sputtering of transition metal dichalcogenide targets is proposed as a new approach for depositing large-area two-dimensional layered materials. Bilayer to few-layer MoS2 deposited by magnetron sputtering followed by post-deposition annealing shows superior area scalability over 20 cm2 and layer-by-layer controllability. High crystallinity of layered MoS2 was confirmed by Raman, photo-luminescence, and transmission electron microscopy analysis. The sputtering temperature and annealing ambience were found to play an important role in the film quality. The top-gate field-effect transistor by using the layered MoS2 channel shows typical n-type characteristics with a current on/off ratio of approximately 104. The relatively low mobility is attributed to the small grain size of 0.1–1 μm with a trap charge density in grain boundaries of the order of 1013 cm–2.

  14. Persistent Photoconductivity in Monolayer MoS2 on Organic-molecule-functionalized Substrates

    NASA Astrophysics Data System (ADS)

    Wang, Wei-Hua; Wu, Yueh-Chun; Chen, Shao-Yu; Liu, Cheng-Hua; Ho, Po-Hsun; Chen, Chun-Wei; Liang, Chi-Te

    2014-03-01

    We demonstrate a giant persistent photoconductivity (PPC) effect in monolayer MoS2 in which the photocurrent robustly persists after illumination has ceased. This PPC effect in monolayer MoS2 on organic-molecule-functionalized substrates sustains up to room temperature and can be highly suppressed by applying source-drain/back-gate voltages to the transistors. Based on this persistency and controllability of the PPC effect, we achieve a room-temperature conductance bistability by utilizing optical and electrical pulses. The observed giant PPC effect in MoS2 can be attributed to a large electron-capture barrier of trap states, which is estimated to be as high as 390 meV.

  15. Tuning the Electrical and Optical Properties of MoS2 under High Pressure

    NASA Astrophysics Data System (ADS)

    Nayak, Avinash; Zhu, Jie; Lin, Jung-Fu; Akinwande, Deji

    2013-06-01

    Transition metal dichalcogenides (TMDCs), such as molybdenum disulfide (MoS2), has been of recent interest to many theoretical and experimental studies. MoS2 has served as a potential material for optoelectronic and field-effect-transistors (FETs) with high on/off ratios (up to 108). MoS2 is composed of quasi-two-dimensional sheets that are stacked on top of one another where each monolayer is tri-layered with a transition metal, molybdenum, in the middle that is covalently bonded to a chalcogen atom, sulfur, located on the top and bottom of the layers. These layers are separated by weak van der Waals (vdW) forces along the c-axis which makes the properties of MoS2 anisotropic. Having control over the electronic properties, and therefore, the band-gap of MoS2, allows for a wide range of applications from electrochemical devices to tunable photo-detectors to be adopted. We demonstrate the electronic phase transition of MoS2 from semiconducting to a metallic state at ~15 GPa. The electronic transport properties in the semiconducting region (lower pressures) exhibits a shockley-like behavior while in the metallic region (higher pressures), we observe ohmic transport. We also examine the light-induced electronic properties by creating optical switches under pressure in greater detail. This photo-current behavior of MoS2 allows for optical switches with three order decrease in turn-on time. We examine the change in the activation energy, optical Raman, XRD, and resistance, by inducing pressure to MoS2 up to 35 GPa.

  16. Prospects of zero Schottky barrier height in a graphene-inserted MoS2-metal interface

    NASA Astrophysics Data System (ADS)

    Chanana, Anuja; Mahapatra, Santanu

    2016-01-01

    A low Schottky barrier height (SBH) at source/drain contact is essential for achieving high drive current in atomic layer MoS2-channel-based field effect transistors. Approaches such as choosing metals with appropriate work functions and chemical doping are employed previously to improve the carrier injection from the contact electrodes to the channel and to mitigate the SBH between the MoS2 and metal. Recent experiments demonstrate significant SBH reduction when graphene layer is inserted between metal slab (Ti and Ni) and MoS2. However, the physical or chemical origin of this phenomenon is not yet clearly understood. In this work, density functional theory simulations are performed, employing pseudopotentials with very high basis sets to get insights of the charge transfer between metal and monolayer MoS2 through the inserted graphene layer. Our atomistic simulations on 16 different interfaces involving five different metals (Ti, Ag, Ru, Au, and Pt) reveal that (i) such a decrease in SBH is not consistent among various metals, rather an increase in SBH is observed in case of Au and Pt; (ii) unlike MoS2-metal interface, the projected dispersion of MoS2 remains preserved in any MoS2-graphene-metal system with shift in the bands on the energy axis. (iii) A proper choice of metal (e.g., Ru) may exhibit ohmic nature in a graphene-inserted MoS2-metal contact. These understandings would provide a direction in developing high-performance transistors involving heteroatomic layers as contact electrodes.

  17. Schottky barrier heights for Au and Pd contacts to MoS2

    NASA Astrophysics Data System (ADS)

    Kaushik, Naveen; Nipane, Ankur; Basheer, Firdous; Dubey, Sudipta; Grover, Sameer; Deshmukh, Mandar M.; Lodha, Saurabh

    2014-09-01

    The search of a p-type metal contact on MoS2 has remained inconclusive, with high work function metals such as Au, Ni, and Pt showing n-type behavior and mixed reports of n as well as p-type behavior for Pd. In this work, we report quantitative Schottky barrier heights for Au and Pd contacts to MoS2 obtained by analysing low temperature transistor characteristics and contact resistance data obtained using the transfer length method. Both Au and Pd exhibit n-type behavior on multilayer as well as monolayer MoS2 transistors with Schottky barrier heights of 0.126 eV and 0.4 eV, and contact resistances of 42 Ω.mm and 18 × 104 Ω.mm respectively. Scanning photocurrent spectroscopy data is in agreement with the resulting energy band alignment in Au-MoS2-Pd devices further reinforcing the observation that the Fermi-level is pinned in the upper half of MoS2 bandgap.

  18. Computational design of p-type contacts for MoS2-based electronic devices

    NASA Astrophysics Data System (ADS)

    Kumar, Priyank; Musso, Tiziana; Foster, Adam; Grossman, Jeffrey

    2015-03-01

    The excellent physical and semiconducting properties of transition metal dichalcogenide (TMDC) monolayers make them promising materials for many applications. A well-known example is MoS2, which has gained significant attention as a channel material for next-generation transistors. While n-type MoS2 field-effect transistors (n-FETs) can be fabricated with relative ease, fabrication of p-FETs remains a challenge as the Fermi-level of elemental metals used as contacts are pinned close to the conduction band, leading to large p-type Schottky barrier heights (SBHs). Using ab initio computations, we design and propose efficient hole contacts utilizing high work function oxide-based hole injection materials, with the aim of advancing p-type MoS2 device technology. Our calculations will highlight the possibility to tune and lower the p-type SBH at the metal/semiconductor interface by controlling the structural properties of oxide materials. Taken together, our results provide an interesting platform for experimental design of next-generation MoS2-based electronic and optoelectronic devices.

  19. Integrated circuits and logic operations based on single-layer MoS2.

    PubMed

    Radisavljevic, Branimir; Whitwick, Michael Brian; Kis, Andras

    2011-12-27

    Logic circuits and the ability to amplify electrical signals form the functional backbone of electronics along with the possibility to integrate multiple elements on the same chip. The miniaturization of electronic circuits is expected to reach fundamental limits in the near future. Two-dimensional materials such as single-layer MoS(2) represent the ultimate limit of miniaturization in the vertical dimension, are interesting as building blocks of low-power nanoelectronic devices, and are suitable for integration due to their planar geometry. Because they are less than 1 nm thin, 2D materials in transistors could also lead to reduced short channel effects and result in fabrication of smaller and more power-efficient transistors. Here, we report on the first integrated circuit based on a two-dimensional semiconductor MoS(2). Our integrated circuits are capable of operating as inverters, converting logical "1" into logical "0", with room-temperature voltage gain higher than 1, making them suitable for incorporation into digital circuits. We also show that electrical circuits composed of single-layer MoS(2) transistors are capable of performing the NOR logic operation, the basis from which all logical operations and full digital functionality can be deduced. PMID:22073905

  20. Flexible low-power RF nanoelectronics in the GHz regime using CVD MoS2

    NASA Astrophysics Data System (ADS)

    Yogeesh, Maruthi

    Two-dimensional (2D) materials have attracted substantial interest for flexible nanoelectronics due to the overall device mechanical flexibility and thickness scalability for high mechanical performance and low operating power. In this work, we demonstrate the first MoS2 RF transistors on flexible substrates based on CVD-grown monolayers, featuring record GHz cutoff frequency (5.6 GHz) and saturation velocity (~1.8×106 cm/s), which is significantly superior to contemporary organic and metal oxide thin-film transistors. Furthermore, multicycle three-point bending results demonstrated the electrical robustness of our flexible MoS2 transistors after 10,000 cycles of mechanical bending. Additionally, basic RF communication circuit blocks such as amplifier, mixer and wireless AM receiver have been demonstrated. These collective results indicate that MoS2 is an ideal advanced semiconducting material for low-power, RF devices for large-area flexible nanoelectronics and smart nanosystems owing to its unique combination of large bandgap, high saturation velocity and high mechanical strength.

  1. Ferroelectric transistors with improved characteristics at high temperature

    NASA Astrophysics Data System (ADS)

    Salvatore, Giovanni A.; Lattanzio, Livio; Bouvet, Didier; Stolichnov, Igor; Setter, Nava; Ionescu, Adrian M.

    2010-08-01

    We report on the temperature dependence of ferroelectric metal-oxide-semiconductor (MOS) transistors and explain the observed improved characteristics based on the dielectric response of ferroelectric materials close to the Curie temperature. The hysteretic current-voltage static characteristics of a fully depleted silicon-on-insulator transistor, with 40 nm vinylidene fluoride trifluorethylene, and 10 nm SiO2 gate stack, are measured from 300 to 400 K. In contrast with conventional MOS field effect transistors (MOSFETs), the subthreshold swing and the transconductance show, respectively, a minimum and a maximum near the Curie temperature (355 K) of the ferroelectric material. A phenomenological model is proposed based on the Landau-Ginzburg theory. This work demonstrates that a MOSFET with a ferroelectric layer integrated in the gate stack could have nondegraded or even improved subthreshold swing and transconductance at high temperature even though the hysteresis window is reduced. As a consequence, we suggest that for ferroelectric transistors with appropriately designed Curie temperatures, the performance degradation of logic or analog circuits, nowadays operating near 100 °C, could be avoided.

  2. Transistor analogs of emergent iono-neuronal dynamics

    PubMed Central

    Rachmuth, Guy; Poon, Chi-Sang

    2008-01-01

    Neuromorphic analog metal-oxide-silicon (MOS) transistor circuits promise compact, low-power, and high-speed emulations of iono-neuronal dynamics orders-of-magnitude faster than digital simulation. However, their inherently limited input voltage dynamic range vs power consumption and silicon die area tradeoffs makes them highly sensitive to transistor mismatch due to fabrication inaccuracy, device noise, and other nonidealities. This limitation precludes robust analog very-large-scale-integration (aVLSI) circuits implementation of emergent iono-neuronal dynamics computations beyond simple spiking with limited ion channel dynamics. Here we present versatile neuromorphic analog building-block circuits that afford near-maximum voltage dynamic range operating within the low-power MOS transistor weak-inversion regime which is ideal for aVLSI implementation or implantable biomimetic device applications. The fabricated microchip allowed robust realization of dynamic iono-neuronal computations such as coincidence detection of presynaptic spikes or pre- and postsynaptic activities. As a critical performance benchmark, the high-speed and highly interactive iono-neuronal simulation capability on-chip enabled our prompt discovery of a minimal model of chaotic pacemaker bursting, an emergent iono-neuronal behavior of fundamental biological significance which has hitherto defied experimental testing or computational exploration via conventional digital or analog simulations. These compact and power-efficient transistor analogs of emergent iono-neuronal dynamics open new avenues for next-generation neuromorphic, neuroprosthetic, and brain-machine interface applications. PMID:19404469

  3. Multibit data storage states formed in plasma-treated MoS₂ transistors.

    PubMed

    Chen, Mikai; Nam, Hongsuk; Wi, Sungjin; Priessnitz, Greg; Gunawan, Ivan Manuel; Liang, Xiaogan

    2014-04-22

    New multibit memory devices are desirable for improving data storage density and computing speed. Here, we report that multilayer MoS2 transistors, when treated with plasmas, can dramatically serve as low-cost, nonvolatile, highly durable memories with binary and multibit data storage capability. We have demonstrated binary and 2-bit/transistor (or 4-level) data states suitable for year-scale data storage applications as well as 3-bit/transistor (or 8-level) data states for day-scale data storage. This multibit memory capability is hypothesized to be attributed to plasma-induced doping and ripple of the top MoS2 layers in a transistor, which could form an ambipolar charge-trapping layer interfacing the underlying MoS2 channel. This structure could enable the nonvolatile retention of charged carriers as well as the reversible modulation of polarity and amount of the trapped charge, ultimately resulting in multilevel data states in memory transistors. Our Kelvin force microscopy results strongly support this hypothesis. In addition, our research suggests that the programming speed of such memories can be improved by using nanoscale-area plasma treatment. We anticipate that this work would provide important scientific insights for leveraging the unique structural property of atomically layered two-dimensional materials in nanoelectronic applications. PMID:24680193

  4. STABILIZED TRANSISTOR AMPLIFIER

    DOEpatents

    Noe, J.B.

    1963-05-01

    A temperature stabilized transistor amplifier having a pair of transistors coupled in cascade relation that are capable of providing amplification through a temperature range of - 100 un. Concent 85% F to 400 un. Concent 85% F described. The stabilization of the amplifier is attained by coupling a feedback signal taken from the emitter of second transistor at a junction between two serially arranged biasing resistances in the circuit of the emitter of the second transistor to the base of the first transistor. Thus, a change in the emitter current of the second transistor is automatically corrected by the feedback adjustment of the base-emitter potential of the first transistor and by a corresponding change in the base-emitter potential of the second transistor. (AEC)

  5. Phase-driven magneto-electrical characteristics of single-layer MoS2

    NASA Astrophysics Data System (ADS)

    Yang, Chao-Yao; Chiu, Kuan-Chang; Chang, Shu-Jui; Zhang, Xin-Quan; Liang, Jaw-Yeu; Chung, Chi-Sheng; Pan, Hui; Wu, Jenn-Ming; Tseng, Yuan-Chieh; Lee, Yi-Hsien

    2016-03-01

    Magnetism of the MoS2 semiconducting atomic layer was highlighted for its great potential in the applications of spintronics and valleytronics. In this study, we demonstrate an evolution of magneto-electrical properties of single layer MoS2 with the modulation of defect configurations and formation of a partial 1T phase. With Ar treatment, sulfur was depleted within the MoS2 flake leading to a 2H (low-spin) --> partial 1T (high-spin) phase transition. The phase transition was accompanied by the development of a ferromagnetic phase. Alternatively, the phase transition could be driven by the desorption of S atoms at the edge of MoS2via O2 treatment while with a different ordering magnitude in magnetism. The edge-sensitive magnetism of the single-layer MoS2 was monitored by magnetic force microscopy and validated by a first-principle calculation with graded-Vs (sulfur vacancy) terminals set at the edge, where band-splitting appeared more prominent with increasing Vs. Treatment with Ar and O2 enabled a dual electrical characteristic of the field effect transistor (FET) that featured linear and saturated responses of different magnitudes in the Ids-Vds curves, whereas the pristine MoS2 FET displayed only a linear electrical dependency. The correlation and tuning of the Vs-1T phase transition would provide a playground for tailoring the phase-driven properties of MoS2 semiconducting atomic layers in spintronic applications.Magnetism of the MoS2 semiconducting atomic layer was highlighted for its great potential in the applications of spintronics and valleytronics. In this study, we demonstrate an evolution of magneto-electrical properties of single layer MoS2 with the modulation of defect configurations and formation of a partial 1T phase. With Ar treatment, sulfur was depleted within the MoS2 flake leading to a 2H (low-spin) --> partial 1T (high-spin) phase transition. The phase transition was accompanied by the development of a ferromagnetic phase. Alternatively, the

  6. MoS2-InGaZnO Heterojunction Phototransistors with Broad Spectral Responsivity.

    PubMed

    Yang, Jaehyun; Kwak, Hyena; Lee, Youngbin; Kang, Yu-Seon; Cho, Mann-Ho; Cho, Jeong Ho; Kim, Yong-Hoon; Jeong, Seong-Jun; Park, Seongjun; Lee, Hoo-Jeong; Kim, Hyoungsub

    2016-04-01

    We introduce an amorphous indium-gallium-zinc-oxide (a-IGZO) heterostructure phototransistor consisting of solution-based synthetic molybdenum disulfide (few-layered MoS2, with a band gap of ∼1.7 eV) and sputter-deposited a-IGZO (with a band gap of ∼3.0 eV) films as a novel sensing element with a broad spectral responsivity. The MoS2 and a-IGZO films serve as a visible light-absorbing layer and a high mobility channel layer, respectively. Spectroscopic measurements reveal that appropriate band alignment at the heterojunction provides effective transfer of the visible light-induced electrons generated in the few-layered MoS2 film to the underlying a-IGZO channel layer with a high carrier mobility. The photoresponse characteristics of the a-IGZO transistor are extended to cover most of the visible range by forming a heterojunction phototransistor that harnesses a visible light responding MoS2 film with a small band gap prepared through a large-area synthetic route. The MoS2-IGZO heterojunction phototransistors exhibit a photoresponsivity of approximately 1.7 A/W at a wavelength of 520 nm (an optical power of 1 μW) with excellent time-dependent photoresponse dynamics. PMID:26989951

  7. Single-layer MoS2 nanopores as nanopower generators.

    PubMed

    Feng, Jiandong; Graf, Michael; Liu, Ke; Ovchinnikov, Dmitry; Dumcenco, Dumitru; Heiranian, Mohammad; Nandigana, Vishal; Aluru, Narayana R; Kis, Andras; Radenovic, Aleksandra

    2016-08-11

    Making use of the osmotic pressure difference between fresh water and seawater is an attractive, renewable and clean way to generate power and is known as 'blue energy'. Another electrokinetic phenomenon, called the streaming potential, occurs when an electrolyte is driven through narrow pores either by a pressure gradient or by an osmotic potential resulting from a salt concentration gradient. For this task, membranes made of two-dimensional materials are expected to be the most efficient, because water transport through a membrane scales inversely with membrane thickness. Here we demonstrate the use of single-layer molybdenum disulfide (MoS2) nanopores as osmotic nanopower generators. We observe a large, osmotically induced current produced from a salt gradient with an estimated power density of up to 10(6) watts per square metre--a current that can be attributed mainly to the atomically thin membrane of MoS2. Low power requirements for nanoelectronic and optoelectric devices can be provided by a neighbouring nanogenerator that harvests energy from the local environment--for example, a piezoelectric zinc oxide nanowire array or single-layer MoS2 (ref. 12). We use our MoS2 nanopore generator to power a MoS2 transistor, thus demonstrating a self-powered nanosystem. PMID:27409806

  8. Effect of interfaces on electron transport properties of MoS2-Au Contacts

    NASA Astrophysics Data System (ADS)

    Aminpour, Maral; Hapala, Prokop; Le, Duy; Jelinek, Pavel; Rahman, Talat S.; Rahman's Group Collaboration; Nanosurf Lab Collaboration

    2014-03-01

    Single layer MoS2 is a promising material for future electronic devices such as transistors since it has good transport characteristics with mobility greater than 200 cm-1V-1s-1 and on-off current ratios up to 108. However, before MoS2 can become a mainstream electronic material for the semiconductor industry, the design of low resistive metal-semiconductor junctions as contacts of the electronic devices needs to be addressed and studied systematically. We have examined the effect of Au contacts on the electronic transport properties of single layer MoS2 using density functional theory in combination with the non-equilibrium Green's function method. The Schottky barrier between Au contact and MoS2, transmission spectra, and I-V curves will be reported and discussed as a function of MoS2 and Au interfaces of varying geometry. This work is supported in part by the US Department of Energy under grant DE-FG02-07ER15842.

  9. Synthesis and characterization of large-area and continuous MoS2 atomic layers by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Hussain, Sajjad; Shehzad, Muhammad Arslan; Vikraman, Dhanasekaran; Khan, Muhammad Farooq; Singh, Jai; Choi, Dong-Chul; Seo, Yongho; Eom, Jonghwa; Lee, Wan-Gyu; Jung, Jongwan

    2016-02-01

    In this article, we report layer-controlled, continuous and large-area molydenum sulfide (MoS2) growth onto a SiO2/Si substrate by RF sputtering combined with sulfurization. A two-step process was employed to synthesize MoS2 films. In the first step, an atomically thin MoO3 film was deposited by RF magnetron sputtering at 300 °C. Subsequently, the as-sputtered MoO3 film was further subjected to post-annealing and sulfurization processes at 650 °C for 1 hour. It was observed that the number of layers of MoS2 can be controlled by adjusting the sputtering time. The fabricated MoS2 transistors exhibited high mobility values of ~21 cm2 V-1 s-1 (bilayer) and ~25 cm2 V-1 s-1 (trilayer), on/off ratios in the range of ~107 (bilayer) and 104-105 (trilayer), respectively. We believe that our proposed paradigm can start a new method for the growth of MoS2 in future electronics and optoelectronics applications.In this article, we report layer-controlled, continuous and large-area molydenum sulfide (MoS2) growth onto a SiO2/Si substrate by RF sputtering combined with sulfurization. A two-step process was employed to synthesize MoS2 films. In the first step, an atomically thin MoO3 film was deposited by RF magnetron sputtering at 300 °C. Subsequently, the as-sputtered MoO3 film was further subjected to post-annealing and sulfurization processes at 650 °C for 1 hour. It was observed that the number of layers of MoS2 can be controlled by adjusting the sputtering time. The fabricated MoS2 transistors exhibited high mobility values of ~21 cm2 V-1 s-1 (bilayer) and ~25 cm2 V-1 s-1 (trilayer), on/off ratios in the range of ~107 (bilayer) and 104-105 (trilayer), respectively. We believe that our proposed paradigm can start a new method for the growth of MoS2 in future electronics and optoelectronics applications. Electronic supplementary information (ESI) available: HRTEM images, XPS spectra and electrical properties. More Raman measurement spectra are obtained for MoS2 films

  10. Phase-driven magneto-electrical characteristics of single-layer MoS2.

    PubMed

    Yang, Chao-Yao; Chiu, Kuan-Chang; Chang, Shu-Jui; Zhang, Xin-Quan; Liang, Jaw-Yeu; Chung, Chi-Sheng; Pan, Hui; Wu, Jenn-Ming; Tseng, Yuan-Chieh; Lee, Yi-Hsien

    2016-03-14

    Magnetism of the MoS2 semiconducting atomic layer was highlighted for its great potential in the applications of spintronics and valleytronics. In this study, we demonstrate an evolution of magneto-electrical properties of single layer MoS2 with the modulation of defect configurations and formation of a partial 1T phase. With Ar treatment, sulfur was depleted within the MoS2 flake leading to a 2H (low-spin) → partial 1T (high-spin) phase transition. The phase transition was accompanied by the development of a ferromagnetic phase. Alternatively, the phase transition could be driven by the desorption of S atoms at the edge of MoS2via O2 treatment while with a different ordering magnitude in magnetism. The edge-sensitive magnetism of the single-layer MoS2 was monitored by magnetic force microscopy and validated by a first-principle calculation with graded-Vs (sulfur vacancy) terminals set at the edge, where band-splitting appeared more prominent with increasing Vs. Treatment with Ar and O2 enabled a dual electrical characteristic of the field effect transistor (FET) that featured linear and saturated responses of different magnitudes in the Ids-Vds curves, whereas the pristine MoS2 FET displayed only a linear electrical dependency. The correlation and tuning of the Vs-1T phase transition would provide a playground for tailoring the phase-driven properties of MoS2 semiconducting atomic layers in spintronic applications. PMID:26892905

  11. Scalable Patterning of MoS2 Nanoribbons by Micromolding in Capillaries.

    PubMed

    Hung, Yu-Han; Lu, Ang-Yu; Chang, Yung-Huang; Huang, Jing-Kai; Chang, Jeng-Kuei; Li, Lain-Jong; Su, Ching-Yuan

    2016-08-17

    In this study, we report a facile approach to prepare dense arrays of MoS2 nanoribbons by combining procedures of micromolding in capillaries (MIMIC) and thermolysis of thiosalts ((NH4)2MoS4) as the printing ink. The obtained MoS2 nanoribbons had a thickness reaching as low as 3.9 nm, a width ranging from 157 to 465 nm, and a length up to 2 cm. MoS2 nanoribbons with an extremely high aspect ratio (length/width) of ∼7.4 × 10(8) were achieved. The MoS2 pattern can be printed on versatile substrates, such as SiO2/Si, sapphire, Au film, FTO/glass, and graphene-coated glass. The degree of crystallinity of the as-prepared MoS2 was discovered to be adjustable by varying the temperature through postannealing. The high-temperature thermolysis (1000 °C) results in high-quality conductive samples, and field-effect transistors based on the patterned MoS2 nanoribbons were demonstrated and characterized, where the carrier mobility was comparable to that of thin-film MoS2. In contrast, the low-temperature-treated samples (170 °C) result in a unique nanocrystalline MoSx structure (x ≈ 2.5), where the abundant and exposed edge sites were obtained from highly dense arrays of nanoribbon structures by this MIMIC patterning method. The patterned MoSx was revealed to have superior electrocatalytic efficiency (an overpotential of ∼211 mV at 10 mA/cm(2) and a Tafel slope of 43 mV/dec) in the hydrogen evolution reaction (HER) when compared to the thin-film MoS2. The report introduces a new concept for rapidly fabricating cost-effective and high-density MoS2/MoSx nanostructures on versatile substrates, which may pave the way for potential applications in nanoelectronics/optoelectronics and frontier energy materials. PMID:27462874

  12. Dual-mode operation of 2D material-base hot electron transistors

    PubMed Central

    Lan, Yann-Wen; Torres, Jr., Carlos M.; Zhu, Xiaodan; Qasem, Hussam; Adleman, James R.; Lerner, Mitchell B.; Tsai, Shin-Hung; Shi, Yumeng; Li, Lain-Jong; Yeh, Wen-Kuan; Wang, Kang L.

    2016-01-01

    Vertical hot electron transistors incorporating atomically-thin 2D materials, such as graphene or MoS2, in the base region have been proposed and demonstrated in the development of electronic and optoelectronic applications. To the best of our knowledge, all previous 2D material-base hot electron transistors only considered applying a positive collector-base potential (VCB > 0) as is necessary for the typical unipolar hot-electron transistor behavior. Here we demonstrate a novel functionality, specifically a dual-mode operation, in our 2D material-base hot electron transistors (e.g. with either graphene or MoS2 in the base region) with the application of a negative collector-base potential (VCB < 0). That is, our 2D material-base hot electron transistors can operate in either a hot-electron or a reverse-current dominating mode depending upon the particular polarity of VCB. Furthermore, these devices operate at room temperature and their current gains can be dynamically tuned by varying VCB. We anticipate our multi-functional dual-mode transistors will pave the way towards the realization of novel flexible 2D material-based high-density and low-energy hot-carrier electronic applications. PMID:27581550

  13. Dual-mode operation of 2D material-base hot electron transistors.

    PubMed

    Lan, Yann-Wen; Torres, Carlos M; Zhu, Xiaodan; Qasem, Hussam; Adleman, James R; Lerner, Mitchell B; Tsai, Shin-Hung; Shi, Yumeng; Li, Lain-Jong; Yeh, Wen-Kuan; Wang, Kang L

    2016-01-01

    Vertical hot electron transistors incorporating atomically-thin 2D materials, such as graphene or MoS2, in the base region have been proposed and demonstrated in the development of electronic and optoelectronic applications. To the best of our knowledge, all previous 2D material-base hot electron transistors only considered applying a positive collector-base potential (VCB > 0) as is necessary for the typical unipolar hot-electron transistor behavior. Here we demonstrate a novel functionality, specifically a dual-mode operation, in our 2D material-base hot electron transistors (e.g. with either graphene or MoS2 in the base region) with the application of a negative collector-base potential (VCB < 0). That is, our 2D material-base hot electron transistors can operate in either a hot-electron or a reverse-current dominating mode depending upon the particular polarity of VCB. Furthermore, these devices operate at room temperature and their current gains can be dynamically tuned by varying VCB. We anticipate our multi-functional dual-mode transistors will pave the way towards the realization of novel flexible 2D material-based high-density and low-energy hot-carrier electronic applications. PMID:27581550

  14. The OverMOS project

    NASA Astrophysics Data System (ADS)

    Das, D.; Dopke, J.; McMahon, S. J.; Turchetta, R.; Villani, G.; Wilson, F.; Worm, S.

    2016-07-01

    The OverMOS project aims to create a fast radiation hard tracking detector sensor, based on High Resistivity CMOS technology. In a first prototype submission, different pixel and charge collection node geometries have been produced, which have lately been returned from fabrication and are currently under test.

  15. Controlled scalable synthesis of uniform, high-quality monolayer and few-layer MoS2 films.

    PubMed

    Yu, Yifei; Li, Chun; Liu, Yi; Su, Liqin; Zhang, Yong; Cao, Linyou

    2013-01-01

    Two dimensional (2D) materials with a monolayer of atoms represent an ultimate control of material dimension in the vertical direction. Molybdenum sulfide (MoS2) monolayers, with a direct bandgap of 1.8 eV, offer an unprecedented prospect of miniaturizing semiconductor science and technology down to a truly atomic scale. Recent studies have indeed demonstrated the promise of 2D MoS2 in fields including field effect transistors, low power switches, optoelectronics, and spintronics. However, device development with 2D MoS2 has been delayed by the lack of capabilities to produce large-area, uniform, and high-quality MoS2 monolayers. Here we present a self-limiting approach that can grow high quality monolayer and few-layer MoS2 films over an area of centimeters with unprecedented uniformity and controllability. This approach is compatible with the standard fabrication process in semiconductor industry. It paves the way for the development of practical devices with 2D MoS2 and opens up new avenues for fundamental research. PMID:23689610

  16. Utilizing self-assembled-monolayer-based gate dielectrics to fabricate molybdenum disulfide field-effect transistors

    NASA Astrophysics Data System (ADS)

    Kawanago, Takamasa; Oda, Shunri

    2016-01-01

    In this study, we apply self-assembled-monolayer (SAM)-based gate dielectrics to the fabrication of molybdenum disulfide (MoS2) field-effect transistors. A simple fabrication process involving the selective formation of a SAM on metal oxides in conjunction with the dry transfer of MoS2 flakes was established. A subthreshold slope (SS) of 69 mV/dec and no hysteresis were demonstrated with the ultrathin SAM-based gate dielectrics accompanied by a low gate leakage current. The small SS and no hysteresis indicate the superior interfacial properties of the MoS2/SAM structure. Cross-sectional transmission electron microscopy revealed a sharp and abrupt interface of the MoS2/SAM structure. The SAM-based gate dielectrics are found to be applicable to the fabrication of low-voltage MoS2 field-effect transistors and can also be extended to various layered semiconductor materials. This study opens up intriguing possibilities of SAM-based gate dielectrics in functional electronic devices.

  17. Low resistance metal contacts to MoS2 devices with nickel-etched-graphene electrodes.

    PubMed

    Leong, Wei Sun; Luo, Xin; Li, Yida; Khoo, Khoong Hong; Quek, Su Ying; Thong, John T L

    2015-01-27

    We report an approach to achieve low-resistance contacts to MoS2 transistors with the intrinsic performance of the MoS2 channel preserved. Through a dry transfer technique and a metal-catalyzed graphene treatment process, nickel-etched-graphene electrodes were fabricated on MoS2 that yield contact resistance as low as 200 Ω · μm. The substantial contact enhancement (∼ 2 orders of magnitude), as compared to pure nickel electrodes, is attributed to the much smaller work function of nickel-graphene electrodes, together with the fact that presence of zigzag edges in the treated graphene surface enhances tunneling between nickel and graphene. To this end, the successful fabrication of a clean graphene-MoS2 interface and a low resistance nickel-graphene interface is critical for the experimentally measured low contact resistance. The potential of using graphene as an electrode interlayer demonstrated in this work paves the way toward achieving high performance next-generation transistors. PMID:25517793

  18. The interfacial properties of SrRuO3/MoS2 heterojunction: a first-principles study

    NASA Astrophysics Data System (ADS)

    Liu, Biao; Wu, Li-Juan; Zhao, Yu-Qing; Wang, Ling-Zhi; Cai, Meng-Qiu

    2016-03-01

    First-principles calculation was used to study the interfacial properties of the SrRuO3 (1 1 1)/MoS2(√3 × √3) heterojunction. It is found that the huge magnetic moments in of monolayer MoS2 largely originate from the Ru-S hybridization for the Ru-terminated interface. Moreover, for the SrO-terminated interface, we studied mainly the metal and semiconductor contact characteristic. The calculated results show that the Schottky barrier height can be significantly reduced to zero for the SrO-terminated interface. Schottky barrier heights dominate the transport behavior of the SrRuO3/MoS2 interface. Our results not only have potential applications in spintronics devices, but also are in favour of the scaling of field effect transistors.

  19. Enhancement of field-effect mobility in molybdenum-disulfide transistor through the treatment of low-power oxygen plasma

    NASA Astrophysics Data System (ADS)

    Chen, Kuan-Chao; Wu, Chong-Rong; Chang, Xiang-Rui; Chang, Shu-Wei; Lee, Si-Chen; Lin, Shih-Yen

    2016-09-01

    We experimentally demonstrate that the treatment with low-power oxygen plasma can raise the field-effect mobility in molybdenum-sulfide (MoS2) transistors from 0.01 to 9.6 cm2 V‑1 s‑1, which is an increment of about three orders of magnitude. The decrease in threshold voltage and the increase in the drain current of the devices indicate that the electron density increases significantly after the mild plasma treatment. The emergence of Mo–O characteristics but the suppression of Mo–S features on the X-ray photoelectron spectrum of the plasma-treated sample suggests that a portion of the MoS2 film becomes conductive molybdenum oxide. This transformation may considerably upgrade the performance of MoS2 transistors.

  20. Atomistic modeling of the metallic-to-semiconducting phase boundaries in monolayer MoS2

    NASA Astrophysics Data System (ADS)

    Saha, Dipankar; Mahapatra, Santanu

    2016-06-01

    Recent experimental demonstration on the coexistence of metallic and semiconducting phases in the same monolayer MoS2 crystal has attracted much attention for its use in ultra-low contact resistance-MoS2 transistors. However, the electronic structures of the metallic-to-semiconducting phase boundaries, which appear to dictate the carrier injection in such transistors, are not yet well understood. In this letter, interfacing the 2H and 1T' polytypes appropriately, we first model the "beta" (β) and the "gamma" (γ) phase boundaries, and demonstrate good agreement with experiential results. We then apply first-principles based density functional theory to calculate the electronic structures for those optimized geometries. We further employ non equilibrium Green's function formalism to evaluate the transmission spectra and the local density of states (LDOS) in order to assess the Schottky barrier nature of the phase boundaries. Our study reveals that while the γ boundary yields p-type Schottky barrier, the β boundary leads to the distinct symmetric Schottky barrier with an atomically sharp transition region. This understanding could be useful for designing high performance transistors using phase-engineered MoS2 crystals.

  1. A MOS for all seasons

    NASA Astrophysics Data System (ADS)

    Bryant, Larry

    1995-01-01

    From a systems perspective, this paper examines the challenges of a single system to support multiple Jet Propulsion Laboratory (JPL) space exploration missions and the need for unitary responsibility for the system. The focus is a Mission Operations System (MOS), which is effectively a mission management organization with direct authority over data system operations, command sequencing, flight operations control, data management, trajectory determination, telemetry and data acquisition, and spacecraft analysis. Stratagems for training and the approach to processes, procedures, and interfaces to facilitate the transition from the present situation to a truly multimission operational environment are developed. The outcome is a paradigm for a MOS that is achievable, that can effectively support multiple projects, and that can take advantage of technological changes without perturbing the entire system.

  2. Photoinduced valley-polarized current of layered MoS2 by electric tuning.

    PubMed

    Yu, Yunjin; Zhou, Yanfeng; Wan, Langhui; Wang, Bin; Xu, Fuming; Wei, Yadong; Wang, Jian

    2016-05-01

    A photoinduced current of a layered MoS2-based transistor is studied from first-principles. Under the illumination of circular polarized light, a valley-polarized current is generated, which can be tuned by the gate voltage. For monolayer MoS2, the valley-polarized spin-up (down) electron current at K ([Formula: see text]) points is induced by the right (left) circular polarized light. The valley polarization is found to reach +1.0 (-1.0) for the valley current that carried such a K ([Formula: see text]) index. For bilayer MoS2, the spin-up (down) current can be induced at both K and [Formula: see text] valleys by the right (left) circular light. In contrast to monolayer MoS2, the photoinduced valley polarization shows asymmetric behavior upon reversal of the gate voltage. Our results show that the valley polarization of the photoinduced current can be modulated by the circular polarized light and the gate voltage. All the results can be well understood using a simple kp model. PMID:27004920

  3. Effects of High-Energy X-Ray Radiation on MoS2 FETs

    NASA Astrophysics Data System (ADS)

    Rai, Amritesh; Thoutam, Laxman; Zhang, Wei; Kovi, Kiran; Banerjee, Sanjay; Das, Saptarshi

    FETs based on semiconducting MoS2 nanosheets are currently being extensively explored for various nanoelectronic device applications. In real-life, several of these applications mandate the exposure of devices to X-ray radiation. In this study, we investigate the effects of high-energy X-ray radiation on few-layer MoS2 transistors. Back-gated MoS2 FETs on SiO2 substrates were fabricated and exposed to X-ray radiation in an enclosed X-ray tube utilizing tungsten as the X-ray source. The devices were exposed to successive radiation doses up to a cumulative dose of 1500 kilorads (Krads). Even after high radiation doses, the devices maintained acceptable electrical performance with high ION/IOFF ratios and good current saturation. The subthreshold swing remained similar to initial values. There was, however, a slight reduction in the ON-currents after each successive radiation, concomitant with a positive threshold voltage shift that can be attributed to the formation of negative-fixed charges in the substrate. Moreover, the maximum transconductance (gm) of the devices decreased slightly with increasing radiation dose. Finally, Raman spectroscopy revealed practically no change in the in-plane and out-of-plane Raman modes of MoS2 after radiation.

  4. Memristive Behavior and Ideal Memristor of 1T Phase MoS2 Nanosheets.

    PubMed

    Cheng, Peifu; Sun, Kai; Hu, Yun Hang

    2016-01-13

    Memristor, which had been predicted a long time ago (Chua, L. O. IEEE Trans. Circuit Theory 1971, 18, 507), was recently invented (Strukov, D. B.; et al. Nature 2008, 453, 80). The introduction of a memristor is expected to open a new era for nonvolatile memory storage, neuromorphic computing, digital logic, and analog circuit. Furthermore, several breakthroughs were made for memristive phenomena and transistors with single-layer MoS2 (Sangwan, V. K.; et al. Nat. Nanotechnol. 2015, 10, 403. van der Zande, A. M.; et al. Nat. Mater. 2013, 12, 554. Liu, H.; et al. ACS Nano 2014, 8, 1031. Bessonov, A. A.; et al. Nat. Mater. 2015, 14, 199. Yuan, J.; et al. Nat. Nanotechnol. 2015, 10, 389). Herein, we demonstrate that 2H phase of bulk MoS2 possessed an ohmic feature, whereas 1T phase of exfoliated MoS2 nanosheets exhibited a unique memristive behavior due to voltage-dependent resistance change. Furthermore, an ideal odd-symmetric memristor with odd-symmetric I-V characteristics was successfully fabricated by the 1T phase MoS2 nanosheets via combining two asymmetric switches antiserially. PMID:26654683

  5. Surface defect passivation of MoS2 by sulfur, selenium, and tellurium

    NASA Astrophysics Data System (ADS)

    Wang, Ying; Qi, Long; Shen, Lei; Wu, Yihong

    2016-04-01

    Few-layer MoS2 field-effect transistors often show an n-type conduction behavior due to the presence of high-density sulfur vacancies. Here, we investigated the possibility of surface defect passivation of MoS2 by sulfur treatment in (NH4)2S solution or coating with an ultrathin layer of selenium or tellurium. It was found that all three elements investigated are able to induce a p-doping effect through suppressing the residual electron concentration by an amount exceeding 0.5 × 1012 cm-2 in few-layer MoS2. Among them, the sulfur-treatment exhibits the most superior thermal stability that survives thermal annealing at temperatures ≥120 °C for at least 10 h. Tellurium exhibits the strongest p-doping effect due to electron trapping by physisorption-induced gap states near the valence band edge. On the other hand, selenium is highly volatile on MoS2; it evaporates and desorbs easily due to Joule heating during electrical measurements in vacuum. The results of first-principles calculations support the experimental observations.

  6. MOS-FET as a Current Sensor in Power Electronics Converters

    PubMed Central

    Pajer, Rok; Milanovič, Miro; Premzel, Branko; Rodič, Miran

    2015-01-01

    This paper presents a current sensing principle appropriate for use in power electronics’ converters. This current measurement principle has been developed for metal oxide semiconductor field effect transistor (MOS-FET) and is based on UDS voltage measurement. In practice, shunt resistors and Hall effect sensors are usually used for these purposes, but the presented principle has many advantages. There is no need for additional circuit elements within high current paths, causing parasitic inductances and increased production complexity. The temperature dependence of MOS-FETs conductive resistance RDS−ON is considered in order to achieve the appropriate measurement accuracy. The “MOS-FET sensor” is also accompanied by a signal acquisition electronics circuit with an appropriate frequency bandwidth. The obtained analogue signal is therefore interposed to an A-D converter for further data acquisition. In order to achieve sufficient accuracy, a temperature compensation and appropriate approximation is used (RDS−ON=RDS−ON(ϑj)). The MOS-FET sensor is calibrated according to a reference sensor based on the Hall-effect principle. The program algorithm is executed on 32-bit ARM M4 MCU, STM32F407. PMID:26213938

  7. MOS-FET as a Current Sensor in Power Electronics Converters.

    PubMed

    Pajer, Rok; Milanoviĉ, Miro; Premzel, Branko; Rodiĉ, Miran

    2015-01-01

    This paper presents a current sensing principle appropriate for use in power electronics' converters. This current measurement principle has been developed for metal oxide semiconductor field effect transistor (MOS-FET) and is based on U(DS) voltage measurement. In practice, shunt resistors and Hall effect sensors are usually used for these purposes, but the presented principle has many advantages. There is no need for additional circuit elements within high current paths, causing parasitic inductances and increased production complexity. The temperature dependence of MOS-FETs conductive resistance R(DS-ON) is considered in order to achieve the appropriate measurement accuracy. The "MOS-FET sensor" is also accompanied by a signal acquisition electronics circuit with an appropriate frequency bandwidth. The obtained analogue signal is therefore interposed to an A-D converter for further data acquisition. In order to achieve sufficient accuracy, a temperature compensation and appropriate approximation is used (R(DS-ON) = R(DS-ON)(θj)). The MOS-FET sensor is calibrated according to a reference sensor based on the Hall-effect principle. The program algorithm is executed on 32-bit ARM M4 MCU, STM32F407. PMID:26213938

  8. Photoinduced valley-polarized current of layered MoS2 by electric tuning

    NASA Astrophysics Data System (ADS)

    Yu, Yunjin; Zhou, Yanfeng; Wan, Langhui; Wang, Bin; Xu, Fuming; Wei, Yadong; Wang, Jian

    2016-05-01

    A photoinduced current of a layered MoS2-based transistor is studied from first-principles. Under the illumination of circular polarized light, a valley-polarized current is generated, which can be tuned by the gate voltage. For monolayer MoS2, the valley-polarized spin-up (down) electron current at K ({K}\\prime ) points is induced by the right (left) circular polarized light. The valley polarization is found to reach +1.0 (-1.0) for the valley current that carried such a K ({K}\\prime ) index. For bilayer MoS2, the spin-up (down) current can be induced at both K and {K}\\prime valleys by the right (left) circular light. In contrast to monolayer MoS2, the photoinduced valley polarization shows asymmetric behavior upon reversal of the gate voltage. Our results show that the valley polarization of the photoinduced current can be modulated by the circular polarized light and the gate voltage. All the results can be well understood using a simple kp model.

  9. Theoretical study of the NO, NO2, CO, SO2, and NH3 adsorptions on multi-diameter single-wall MoS2 nanotube

    NASA Astrophysics Data System (ADS)

    Cao, Rongfang; Zhou, Bo; Jia, Cuifang; Zhang, Xiaodong; Jiang, Zhenyi

    2016-02-01

    On the basis of first-principles calculations, the ability of a single-wall MoS2 nanotube to detect NO, NO2, CO, SO2, and NH3 gas molecules is studied. The most stable adsorption configurations, adsorption energies, and charge transfers are calculated. Among these gas molecules, the NO molecule has the biggest interaction with the MoS2 nanotube. The adsorption energy of NO on the nanotube is 129.3 meV, which is almost double compared to that for the monolayer (74.4 meV). The charge density difference calculation shows that all the molecules on the MoS2 nanotube act as electron acceptors except NH3. The charge transfer between NO and the nanotube is still one order of magnitude higher than that for the monolayer. Compared with the results for these molecules adsorbed on the MoS2 monolayer, the nanotube is more sensitive, especially for the NO molecule. Moreover, a comparative study of MoS2 nanotubes with different diameters (curvatures) indicates that the NO adsorption capability of the outer surface decreases on the increasing radius. It is predicted that the MoS2 nanotube with a smaller diameter should increase the stability and sensitivity of MoS2-based field-effect-transistor (FET) sensors.

  10. MoS2 spaser

    NASA Astrophysics Data System (ADS)

    Jayasekara, Charith; Premaratne, Malin; Gunapala, Sarath D.; Stockman, Mark I.

    2016-04-01

    We present a comprehensive analysis of a spaser made of a circular shaped highly doped molybdenum disulfide (MoS2) resonator. "Spaser" is an acronym for "surface plasmon amplification by stimulated emission of radiation"-a nanoscale source of surface plasmons generated by stimulated emission in a plasmonic resonator which receives energy nonradiatively. By considering localized surface plasmon modes, operation characteristics of the model are analysed, and tunability of the design is demonstrated. We find the optimum geometric and material parameters of the spaser that provides efficient outputs and carryout a comparative analysis with a similar circular spaser made of graphene. Owing to physical and chemical properties of MoS2 and the active medium, the proposed design delivers efficient outputs in terms of spaser mode energy, operating thresholds, Q-factor, and electric field amplitude. Lower operating thresholds and higher mode energies are notable advantages of the design. Owing to having many superior features to existing similar designs, this MoS2 spaser may be much suited for applications in nanoplasmonic devices.

  11. Chemical free device fabrication of two dimensional van der Waals materials based transistors by using one-off stamping

    NASA Astrophysics Data System (ADS)

    Lee, Young Tack; Choi, Won Kook; Hwang, Do Kyung

    2016-06-01

    We report on a chemical free one-off imprinting method to fabricate two dimensional (2D) van der Waals (vdWs) materials based transistors. Such one-off imprinting technique is the simplest and effective way to prevent unintentional chemical reaction or damage of 2D vdWs active channel during device fabrication process. 2D MoS2 nanosheets based transistors with a hexagonal-boron-nitride (h-BN) passivation layer, prepared by one-off imprinting, show negligible variations of transfer characteristics after chemical vapor deposition process. In addition, this method enables the fabrication of all 2D MoS2 transistors consisting of h-BN gate insulator, and graphene source/drain and gate electrodes without any chemical damage.

  12. Oxidation of gallium arsenide in a plasma multipole device. Study of the MOS structures obtained

    NASA Technical Reports Server (NTRS)

    Gourrier, S.; Mircea, A.; Simondet, F.

    1980-01-01

    The oxygen plasma oxidation of GaAs was studied in order to obtain extremely high frequency responses with MOS devices. In the multipole system a homogeneous oxygen plasma of high density can easily be obtained in a large volume. This system is thus convenient for the study of plasma oxidation of GaAs. The electrical properties of the MOS diodes obtained in this way are controlled by interface states, located mostly in the upper half of the band gap where densities in the 10 to the 13th power/(sq cm) (eV) range can be estimated. Despite these interface states the possibility of fabricating MOSFET transistors working mostly in the depletion mode for a higher frequency cut-off still exists.

  13. The Integration of Sub-10 nm Gate Oxide on MoS2 with Ultra Low Leakage and Enhanced Mobility

    PubMed Central

    Yang, Wen; Sun, Qing-Qing; Geng, Yang; Chen, Lin; Zhou, Peng; Ding, Shi-Jin; Zhang, David Wei

    2015-01-01

    The integration of ultra-thin gate oxide, especially at sub-10 nm region, is one of the principle problems in MoS2 based transistors. In this work, we demonstrate sub-10 nm uniform deposition of Al2O3 on MoS2 basal plane by applying ultra-low energy remote oxygen plasma pretreatment prior to atomic layer deposition. It is demonstrated that oxygen species in ultra-low energy plasma are physically adsorbed on MoS2 surfaces without making the flakes oxidized, and is capable of benefiting the mobility of MoS2 flake. Based on this method, top-gated MoS2 transistor with ultrathin Al2O3 dielectric is fabricated. With 6.6 nm Al2O3 as gate dielectric, the device shows gate leakage about 0.1 pA/μm2 at 4.5 MV/cm which is much lower than previous reports. Besides, the top-gated device shows great on/off ratio of over 108, subthreshold swing (SS) of 101 mV/dec and a mobility of 28 cm2/Vs. With further investigations and careful optimizations, this method can play an important role in future nanoelectronics. PMID:26146017

  14. Polarity control in WSe2 double-gate transistors

    NASA Astrophysics Data System (ADS)

    Resta, Giovanni V.; Sutar, Surajit; Balaji, Yashwanth; Lin, Dennis; Raghavan, Praveen; Radu, Iuliana; Catthoor, Francky; Thean, Aaron; Gaillardon, Pierre-Emmanuel; de Micheli, Giovanni

    2016-07-01

    As scaling of conventional silicon-based electronics is reaching its ultimate limit, considerable effort has been devoted to find new materials and new device concepts that could ultimately outperform standard silicon transistors. In this perspective two-dimensional transition metal dichalcogenides, such as MoS2 and WSe2, have recently attracted considerable interest thanks to their electrical properties. Here, we report the first experimental demonstration of a doping-free, polarity-controllable device fabricated on few-layer WSe2. We show how modulation of the Schottky barriers at drain and source by a separate gate, named program gate, can enable the selection of the carriers injected in the channel, and achieved controllable polarity behaviour with ON/OFF current ratios >106 for both electrons and holes conduction. Polarity-controlled WSe2 transistors enable the design of compact logic gates, leading to higher computational densities in 2D-flatronics.

  15. Polarity control in WSe2 double-gate transistors.

    PubMed

    Resta, Giovanni V; Sutar, Surajit; Balaji, Yashwanth; Lin, Dennis; Raghavan, Praveen; Radu, Iuliana; Catthoor, Francky; Thean, Aaron; Gaillardon, Pierre-Emmanuel; de Micheli, Giovanni

    2016-01-01

    As scaling of conventional silicon-based electronics is reaching its ultimate limit, considerable effort has been devoted to find new materials and new device concepts that could ultimately outperform standard silicon transistors. In this perspective two-dimensional transition metal dichalcogenides, such as MoS2 and WSe2, have recently attracted considerable interest thanks to their electrical properties. Here, we report the first experimental demonstration of a doping-free, polarity-controllable device fabricated on few-layer WSe2. We show how modulation of the Schottky barriers at drain and source by a separate gate, named program gate, can enable the selection of the carriers injected in the channel, and achieved controllable polarity behaviour with ON/OFF current ratios >10(6) for both electrons and holes conduction. Polarity-controlled WSe2 transistors enable the design of compact logic gates, leading to higher computational densities in 2D-flatronics. PMID:27390014

  16. Polarity control in WSe2 double-gate transistors

    PubMed Central

    Resta, Giovanni V.; Sutar, Surajit; Balaji, Yashwanth; Lin, Dennis; Raghavan, Praveen; Radu, Iuliana; Catthoor, Francky; Thean, Aaron; Gaillardon, Pierre-Emmanuel; de Micheli, Giovanni

    2016-01-01

    As scaling of conventional silicon-based electronics is reaching its ultimate limit, considerable effort has been devoted to find new materials and new device concepts that could ultimately outperform standard silicon transistors. In this perspective two-dimensional transition metal dichalcogenides, such as MoS2 and WSe2, have recently attracted considerable interest thanks to their electrical properties. Here, we report the first experimental demonstration of a doping-free, polarity-controllable device fabricated on few-layer WSe2. We show how modulation of the Schottky barriers at drain and source by a separate gate, named program gate, can enable the selection of the carriers injected in the channel, and achieved controllable polarity behaviour with ON/OFF current ratios >106 for both electrons and holes conduction. Polarity-controlled WSe2 transistors enable the design of compact logic gates, leading to higher computational densities in 2D-flatronics. PMID:27390014

  17. Vibrational and optical properties of MoS2: From monolayer to bulk

    NASA Astrophysics Data System (ADS)

    Molina-Sánchez, Alejandro; Hummer, Kerstin; Wirtz, Ludger

    2015-12-01

    Molybdenum disulfide, MoS2, has recently gained considerable attention as a layered material where neighboring layers are only weakly interacting and can easily slide against each other. Therefore, mechanical exfoliation allows the fabrication of single and multi-layers and opens the possibility to generate atomically thin crystals with outstanding properties. In contrast to graphene, it has an optical gap of ~1.9 eV. This makes it a prominent candidate for transistor and opto-electronic applications. Single-layer MoS2 exhibits remarkably different physical properties compared to bulk MoS2 due to the absence of interlayer hybridization. For instance, while the band gap of bulk and multi-layer MoS2 is indirect, it becomes direct with decreasing number of layers. In this review, we analyze from a theoretical point of view the electronic, optical, and vibrational properties of single-layer, few-layer and bulk MoS2. In particular, we focus on the effects of spin-orbit interaction, number of layers, and applied tensile strain on the vibrational and optical properties. We examine the results obtained by different methodologies, mainly ab initio approaches. We also discuss which approximations are suitable for MoS2 and layered materials. The effect of external strain on the band gap of single-layer MoS2 and the crossover from indirect to direct band gap is investigated. We analyze the excitonic effects on the absorption spectra. The main features, such as the double peak at the absorption threshold and the high-energy exciton are presented. Furthermore, we report on the the phonon dispersion relations of single-layer, few-layer and bulk MoS2. Based on the latter, we explain the behavior of the Raman-active A1g and E2g1 modes as a function of the number of layers. Finally, we compare theoretical and experimental results of Raman, photoluminescence, and optical-absorption spectroscopy.

  18. Experimental study of time-dependent dielectric breakdown in tri-gate nanowire transistor

    NASA Astrophysics Data System (ADS)

    Ota, Kensuke; Tanaka, Chika; Numata, Toshinori; Matsushita, Daisuke; Saitoh, Masumi

    2016-08-01

    We systematically investigate the size dependence of the time-dependent dielectric breakdown (TDDB) in a tri-gate nanowire transistor (NW Tr.). It is newly found that TDDB reliability is degraded in NW Tr. as compared with that in a planar transistor owing to the locally enhanced electric field at the NW corner. Moreover, in the region with a width (W) less than 40 nm, nanowire width reduction leads to a shorter time to gate dielectric breakdown indicating additional degradation of TDDB reliability in NW Tr. with smaller W. Although TDDB in three-dimensional (3D) MOS structures such as a trench MOS capacitor has already been reported, the size dependence of TDDB in scaled NW Tr. is firstly discussed in this paper since a trench capacitor is different from recent NW Tr. in structure, device size, gate dielectric thickness, and scaling effect on TDDB.

  19. Synthesis and characterization of large-area and continuous MoS2 atomic layers by RF magnetron sputtering.

    PubMed

    Hussain, Sajjad; Shehzad, Muhammad Arslan; Vikraman, Dhanasekaran; Khan, Muhammad Farooq; Singh, Jai; Choi, Dong-Chul; Seo, Yongho; Eom, Jonghwa; Lee, Wan-Gyu; Jung, Jongwan

    2016-02-21

    In this article, we report layer-controlled, continuous and large-area molydenum sulfide (MoS2) growth onto a SiO2/Si substrate by RF sputtering combined with sulfurization. A two-step process was employed to synthesize MoS2 films. In the first step, an atomically thin MoO3 film was deposited by RF magnetron sputtering at 300 °C. Subsequently, the as-sputtered MoO3 film was further subjected to post-annealing and sulfurization processes at 650 °C for 1 hour. It was observed that the number of layers of MoS2 can be controlled by adjusting the sputtering time. The fabricated MoS2 transistors exhibited high mobility values of ∼21 cm(2) V(-1) s(-1) (bilayer) and ∼25 cm(2) V(-1) s(-1) (trilayer), on/off ratios in the range of ∼10(7) (bilayer) and 10(4)-10(5) (trilayer), respectively. We believe that our proposed paradigm can start a new method for the growth of MoS2 in future electronics and optoelectronics applications. PMID:26838294

  20. Plasmonic Gold Nanorods Coverage Influence on Enhancement of the Photoluminescence of Two-Dimensional MoS2 Monolayer

    PubMed Central

    Lee, Kevin C. J.; Chen, Yi-Huan; Lin, Hsiang-Yu; Cheng, Chia-Chin; Chen, Pei-Ying; Wu, Ting-Yi; Shih, Min-Hsiung; Wei, Kung-Hwa; Li, Lain-Jong; Chang, Chien-Wen

    2015-01-01

    The 2-D transition metal dichalcogenide (TMD) semiconductors, has received great attention due to its excellent optical and electronic properties and potential applications in field-effect transistors, light emitting and sensing devices. Recently surface plasmon enhanced photoluminescence (PL) of the weak 2-D TMD atomic layers was developed to realize the potential optoelectronic devices. However, we noticed that the enhancement would not increase monotonically with increasing of metal plasmonic objects and the emission drop after the certain coverage. This study presents the optimized PL enhancement of a monolayer MoS2 in the presence of gold (Au) nanorods. A localized surface plasmon wave of Au nanorods that generated around the monolayer MoS2 can provide resonance wavelength overlapping with that of the MoS2 gain spectrum. These spatial and spectral overlapping between the localized surface plasmon polariton waves and that from MoS2 emission drastically enhanced the light emission from the MoS2 monolayer. We gave a simple model and physical interpretations to explain the phenomena. The plasmonic Au nanostructures approach provides a valuable avenue to enhancing the emitting efficiency of the 2-D nano-materials and their devices for the future optoelectronic devices and systems. PMID:26576041

  1. Field-effect transistors based on few-layered α-MoTe(2).

    PubMed

    Pradhan, Nihar R; Rhodes, Daniel; Feng, Simin; Xin, Yan; Memaran, Shahriar; Moon, Byoung-Hee; Terrones, Humberto; Terrones, Mauricio; Balicas, Luis

    2014-06-24

    Here we report the properties of field-effect transistors based on a few layers of chemical vapor transport grown α-MoTe2 crystals mechanically exfoliated onto SiO2. We performed field-effect and Hall mobility measurements, as well as Raman scattering and transmission electron microscopy. In contrast to both MoS2 and MoSe2, our MoTe2 field-effect transistors are observed to be hole-doped, displaying on/off ratios surpassing 10(6) and typical subthreshold swings of ∼140 mV per decade. Both field-effect and Hall mobilities indicate maximum values approaching or surpassing 10 cm(2)/(V s), which are comparable to figures previously reported for single or bilayered MoS2 and/or for MoSe2 exfoliated onto SiO2 at room temperature and without the use of dielectric engineering. Raman scattering reveals sharp modes in agreement with previous reports, whose frequencies are found to display little or no dependence on the number of layers. Given that MoS2 is electron-doped, the stacking of MoTe2 onto MoS2 could produce ambipolar field-effect transistors and a gap modulation. Although the overall electronic performance of MoTe2 is comparable to those of MoS2 and MoSe2, the heavier element Te leads to a stronger spin-orbit coupling and possibly to concomitantly longer decoherence times for exciton valley and spin indexes. PMID:24878323

  2. A highly sensitive, highly transparent, gel-gated MoS2 phototransistor on biodegradable nanopaper

    NASA Astrophysics Data System (ADS)

    Zhang, Qing; Bao, Wenzhong; Gong, Amy; Gong, Tao; Ma, Dakang; Wan, Jiayu; Dai, Jiaqi; Munday, Jeremy N.; He-Hau, Jr.; Hu, Liangbing; Zhang, Daihua

    2016-07-01

    Transition metal dichalcogenides hold great promise for a variety of novel electrical, optical and mechanical devices and applications. Among them, molybdenum disulphide (MoS2) is gaining increasing attention as gate dielectrics and semiconductive channels for high-performance field effect transistors. Here we report on the first MoS2 phototransistor built on a flexible, transparent and biodegradable substrate with an electrolyte gate dielectric. We have carried out systematic studies on its electrical and optoelectronic properties. The MoS2 phototransistor exhibited an excellent photoresponsivity of ~1.5 kA W-1, about two times higher compared to typical back-gated devices reported in previous studies. The device is highly transparent at the same time with an average optical transmittance of 82%. Successful fabrication of phototransistors on flexible cellulose nanopaper with excellent performance and transparency suggests that it is feasible to achieve an ecofriendly and biodegradable phototransistor with great photoresponsivity, broad spectral range and durable flexibility.Transition metal dichalcogenides hold great promise for a variety of novel electrical, optical and mechanical devices and applications. Among them, molybdenum disulphide (MoS2) is gaining increasing attention as gate dielectrics and semiconductive channels for high-performance field effect transistors. Here we report on the first MoS2 phototransistor built on a flexible, transparent and biodegradable substrate with an electrolyte gate dielectric. We have carried out systematic studies on its electrical and optoelectronic properties. The MoS2 phototransistor exhibited an excellent photoresponsivity of ~1.5 kA W-1, about two times higher compared to typical back-gated devices reported in previous studies. The device is highly transparent at the same time with an average optical transmittance of 82%. Successful fabrication of phototransistors on flexible cellulose nanopaper with excellent

  3. Flexible black phosphorus ambipolar transistors, circuits and AM demodulator.

    PubMed

    Zhu, Weinan; Yogeesh, Maruthi N; Yang, Shixuan; Aldave, Sandra H; Kim, Joon-Seok; Sonde, Sushant; Tao, Li; Lu, Nanshu; Akinwande, Deji

    2015-03-11

    High-mobility two-dimensional (2D) semiconductors are desirable for high-performance mechanically flexible nanoelectronics. In this work, we report the first flexible black phosphorus (BP) field-effect transistors (FETs) with electron and hole mobilities superior to what has been previously achieved with other more studied flexible layered semiconducting transistors such as MoS2 and WSe2. Encapsulated bottom-gated BP ambipolar FETs on flexible polyimide afforded maximum carrier mobility of about 310 cm(2)/V·s with field-effect current modulation exceeding 3 orders of magnitude. The device ambipolar functionality and high-mobility were employed to realize essential circuits of electronic systems for flexible technology including ambipolar digital inverter, frequency doubler, and analog amplifiers featuring voltage gain higher than other reported layered semiconductor flexible amplifiers. In addition, we demonstrate the first flexible BP amplitude-modulated (AM) demodulator, an active stage useful for radio receivers, based on a single ambipolar BP transistor, which results in audible signals when connected to a loudspeaker or earphone. Moreover, the BP transistors feature mechanical robustness up to 2% uniaxial tensile strain and up to 5000 bending cycles. PMID:25715122

  4. Vertical organic transistors

    NASA Astrophysics Data System (ADS)

    Lüssem, Björn; Günther, Alrun; Fischer, Axel; Kasemann, Daniel; Leo, Karl

    2015-11-01

    Organic switching devices such as field effect transistors (OFETs) are a key element of future flexible electronic devices. So far, however, a commercial breakthrough has not been achieved because these devices usually lack in switching speed (e.g. for logic applications) and current density (e.g. for display pixel driving). The limited performance is caused by a combination of comparatively low charge carrier mobilities and the large channel length caused by the need for low-cost structuring. Vertical Organic Transistors are a novel technology that has the potential to overcome these limitations of OFETs. Vertical Organic Transistors allow to scale the channel length of organic transistors into the 100 nm regime without cost intensive structuring techniques. Several different approaches have been proposed in literature, which show high output currents, low operation voltages, and comparatively high speed even without sub-μm structuring technologies. In this review, these different approaches are compared and recent progress is highlighted.

  5. A New Electrolytic Synthesis Method for Few-Layered MoS2 Nanosheets and Their Robust Biointerfacing with Reduced Antibodies.

    PubMed

    Kukkar, Manil; Tuteja, Satish K; Sharma, Amit L; Kumar, Vinod; Paul, Ashok K; Kim, Ki-Hyun; Sabherwal, Priyanka; Deep, Akash

    2016-07-01

    We report an efficient method for the synthesis of few-layered MoS2 nanosheets and demonstrate their application in the label-free detection of the prostate-specific antigen (PSA) cancer marker. As a novel strategy, the electro-dissolution of molybdenum metal sheets in the presence of Na(+) and S(2-) ions led to the formation of Na(+) intercalated MoS2. Further exfoliation by ultrasonication yielded the desired formation of few-layered MoS2 nanosheets. After comprehensive characterization, the synthesized MoS2 nanosheets were channeled in a field-effect transistor (FET) microdevice. Chemically reduced anti-PSA antibodies were immobilized on the MoS2 channel above the FET microdevice to construct a specific PSA immunosensor. The antibodies were deliberately reduced to expose the hinge-region disulfide bonds. This approach offered a robust and site-directed immunosensing device through biointerfacing of the sulfhydryl groups (-SH) in the reduced antibody with the surface S atoms of MoS2. This device was validated as an effective immunosensor with a low detection limit (10(-5) ng/mL) over a wide linear detection range (10(-5) to 75 ng/mL). PMID:27296984

  6. Photoelectron spectroscopic imaging and device applications of large-area patternable single-layer MoS2 synthesized by chemical vapor deposition.

    PubMed

    Park, Woanseo; Baik, Jaeyoon; Kim, Tae-Young; Cho, Kyungjune; Hong, Woong-Ki; Shin, Hyun-Joon; Lee, Takhee

    2014-05-27

    Molybdenum disulfide (MoS2) films, which are only a single atomic layer thick, have been synthesized by chemical vapor deposition (CVD) and have gained significant attention due to their band-gap semiconducting properties. However, in order for them to be useful for the fabrication of practical devices, patterning processes that can be used to form specific MoS2 structures must be integrated with the existing synthetic approaches. Here, we report a method for the synthesis of centimeter-scale, high-quality single-layer MoS2 that can be directly patterned during CVD, so that postpatterning processes can be avoided and device fabrication can be streamlined. Utilizing X-ray photoelectron spectroscopic imaging, we characterize the chemical states of these CVD-synthesized single-layer MoS2 films and demonstrate that the triangular-shaped MoS2 are single-crystalline single-domain monolayers. We also demonstrate the use of these high-quality and directly patterned MoS2 films in electronic device applications by fabricating and characterizing field effect transistors. PMID:24730654

  7. Transistor-based interface circuitry

    DOEpatents

    Taubman, Matthew S.

    2004-02-24

    Among the embodiments of the present invention is an apparatus that includes a transistor, a servo device, and a current source. The servo device is operable to provide a common base mode of operation of the transistor by maintaining an approximately constant voltage level at the transistor base. The current source is operable to provide a bias current to the transistor. A first device provides an input signal to an electrical node positioned between the emitter of the transistor and the current source. A second device receives an output signal from the collector of the transistor.

  8. Transistor-based interface circuitry

    DOEpatents

    Taubman, Matthew S.

    2007-02-13

    Among the embodiments of the present invention is an apparatus that includes a transistor, a servo device, and a current source. The servo device is operable to provide a common base mode of operation of the transistor by maintaining an approximately constant voltage level at the transistor base. The current source is operable to provide a bias current to the transistor. A first device provides an input signal to an electrical node positioned between the emitter of the transistor and the current source. A second device receives an output signal from the collector of the transistor.

  9. Preventing Simultaneous Conduction In Switching Transistors

    NASA Technical Reports Server (NTRS)

    Mclyman, William T.

    1990-01-01

    High voltage spikes and electromagnetic interference suppressed. Power-supply circuit including two switching transistors easily modified to prevent simultaneous conduction by both transistors during switching intervals. Diode connected between collector of each transistor and driving circuit for opposite transistor suppresses driving signal to transistor being turned on until transistor being turned off ceases to carry current.

  10. Ambipolar Light-Emitting Transistors on Chemical Vapor Deposited Monolayer MoS₂.

    PubMed

    Ponomarev, Evgeniy; Gutiérrez-Lezama, Ignacio; Ubrig, Nicolas; Morpurgo, Alberto F

    2015-12-01

    We realize and investigate ionic liquid gated field-effect transistors (FETs) on large-area MoS2 monolayers grown by chemical vapor deposition (CVD). Under electron accumulation, the performance of these devices is comparable to that of FETs based on exfoliated flakes. FETs on CVD-grown material, however, exhibit clear ambipolar transport, which for MoS2 monolayers had not been reported previously. We exploit this property to estimate the bandgap Δ of monolayer MoS2 directly from the device transfer curves and find Δ ≈ 2.4-2.7 eV. In the ambipolar injection regime, we observe electroluminescence due to exciton recombination in MoS2, originating from the region close to the hole-injecting contact. Both the observed transport properties and the behavior of the electroluminescence can be consistently understood as due to the presence of defect states at an energy of 250-300 meV above the top of the valence band, acting as deep traps for holes. Our results are of technological relevance, as they show that devices with useful optoelectronic functionality can be realized on large-area MoS2 monolayers produced by controllable and scalable techniques. PMID:26594892

  11. Deuterium-incorporated gate oxide of MOS devices fabricated by using deuterium ion implantation

    NASA Astrophysics Data System (ADS)

    Lee, Jae-Sung; Lear, Kevin L.

    2012-04-01

    In the aspect of metal-oxide-semiconductor (MOS) device reliability, deuterium-incorporated gate oxide could be utilized to suppress the wear-out that is combined with oxide trap generation. An alternative deuterium process for the passivation of oxide traps or defects in the gate oxide of MOS devices has been suggested in this study. The deuterium ion is delivered to the location where the gate oxide resides by using an implantation process and subsequent N2 annealing process at the back-end of metallization process. A conventional MOS field-effect transistor (MOSFET) with a 3-nm-thick gate oxide and poly-to-ploy capacitor sandwiched with 20-nm-thick SiO2 were fabricated in order to demonstrate the deuterium effect in our process. An optimum condition of ion implantation was necessary to account for the topography of the overlaying layers in the device structure and to minimize the physical damage due to the energy of the implanted ion. Device parameter variations, the gate leakage current, and the dielectric breakdown phenomenon were investigated in the deuterium-ion-implanted devices. We found the isotope effect between hydrogen- and deuterium-implanted devices and an improved electrical reliability in the deuterated gate oxide. This implies that deuterium bonds are generated effectively at the Si/SiO2 interface and in the SiO2 bulk.

  12. A highly sensitive, highly transparent, gel-gated MoS2 phototransistor on biodegradable nanopaper.

    PubMed

    Zhang, Qing; Bao, Wenzhong; Gong, Amy; Gong, Tao; Ma, Dakang; Wan, Jiayu; Dai, Jiaqi; Munday, Jeremy N; He, Jr-Hau; Hu, Liangbing; Zhang, Daihua

    2016-08-01

    Transition metal dichalcogenides hold great promise for a variety of novel electrical, optical and mechanical devices and applications. Among them, molybdenum disulphide (MoS2) is gaining increasing attention as gate dielectrics and semiconductive channels for high-performance field effect transistors. Here we report on the first MoS2 phototransistor built on a flexible, transparent and biodegradable substrate with an electrolyte gate dielectric. We have carried out systematic studies on its electrical and optoelectronic properties. The MoS2 phototransistor exhibited an excellent photoresponsivity of ∼1.5 kA W(-1), about two times higher compared to typical back-gated devices reported in previous studies. The device is highly transparent at the same time with an average optical transmittance of 82%. Successful fabrication of phototransistors on flexible cellulose nanopaper with excellent performance and transparency suggests that it is feasible to achieve an ecofriendly and biodegradable phototransistor with great photoresponsivity, broad spectral range and durable flexibility. PMID:27396391

  13. Gate-Tunable Atomically Thin Lateral MoS2 Schottky Junction Patterned by Electron Beam.

    PubMed

    Katagiri, Y; Nakamura, T; Ishii, A; Ohata, C; Hasegawa, M; Katsumoto, S; Cusati, T; Fortunelli, A; Iannaccone, G; Fiori, G; Roche, S; Haruyama, J

    2016-06-01

    Among atomically thin two-dimensional (2D) materials, molybdenum disulfide (MoS2) is attracting considerable attention because of its direct bandgap in the 2H-semiconducting phase. On the other hand, a 1T-metallic phase has been revealed, bringing complementary application. Recently, thanks to top-down fabrication using electron beam (EB) irradiation techniques, in-plane 1T-metal/2H-semiconductor lateral (Schottky) MoS2 junctions were demonstrated, opening a path toward the co-integration of active and passive two-dimensional devices. Here, we report the first transport measurements evidencing the formation of a MoS2 Schottky barrier (SB) junction with barrier height of 0.13-0.18 eV created at the interface between EB-irradiated (1T)/nonirradiated (2H) regions. Our experimental findings, supported by state-of-the-art simulation, reveal unique device fingerprint of SB-based field-effect transistors made from atom-thin 1T layers. PMID:27152475

  14. Boron nitride housing cools transistors

    NASA Technical Reports Server (NTRS)

    1965-01-01

    Boron nitride ceramic heat sink cools transistors in r-f transmitter and receiver circuits. Heat dissipated by the transistor is conducted by the boron nitride housing to the metal chassis on which it is mounted.

  15. NANOELECTRONICS. Epitaxial growth of a monolayer WSe2-MoS2 lateral p-n junction with an atomically sharp interface.

    PubMed

    Li, Ming-Yang; Shi, Yumeng; Cheng, Chia-Chin; Lu, Li-Syuan; Lin, Yung-Chang; Tang, Hao-Lin; Tsai, Meng-Lin; Chu, Chih-Wei; Wei, Kung-Hwa; He, Jr-Hau; Chang, Wen-Hao; Suenaga, Kazu; Li, Lain-Jong

    2015-07-31

    Two-dimensional transition metal dichalcogenides (TMDCs) such as molybdenum sulfide MoS2 and tungsten sulfide WSe2 have potential applications in electronics because they exhibit high on-off current ratios and distinctive electro-optical properties. Spatially connected TMDC lateral heterojunctions are key components for constructing monolayer p-n rectifying diodes, light-emitting diodes, photovoltaic devices, and bipolar junction transistors. However, such structures are not readily prepared via the layer-stacking techniques, and direct growth favors the thermodynamically preferred TMDC alloys. We report the two-step epitaxial growth of lateral WSe2-MoS2 heterojunction, where the edge of WSe2 induces the epitaxial MoS2 growth despite a large lattice mismatch. The epitaxial growth process offers a controllable method to obtain lateral heterojunction with an atomically sharp interface. PMID:26228146

  16. Radiation effects in LDD MOS devices

    SciTech Connect

    Woodruff, R.L.; Adams, J.R.

    1987-12-01

    The purpose of this work is to investigate the response of lightly doped drain (LDD) n-channel transistors to ionizing radiation. Transistors were fabricated with conventional (non-LDD) and lightly doped drain (LDD) structures using both standard (non-hardened) and radiation hardened gate oxides. Characterization of the transistors began with a correlation of the total-dose effects due to 10 keV x-rays with Co-60 gamma rays. The authors find that for the gate oxides and transistor structures investigated in this work, 10 keV x-rays produce more fixed-charge guild-up in the gate oxide, and more interface charge than do Co-60 gamma rays. They determined that the radiation response of LDD transistors is similar to that of conventional (non-LDD) transistors. In addition, both standard and radiation-hardened transistors subjected to hot carrier stress before irradiation show a similar radiation response. After exposure to 1.0 x 10/sup 6/ rads(Si), non-hardened transistors show increased susceptibility to hot-carrier graduation, while the radiation-hardened transistors exhibit similar hot-carrier degradation to non-irradiated devices. The authors have demonstrated a fully-integrated radiation hardened process tht is solid to 1.0 x 10/sup 6/ rads(Si), and shows promise for achieving 1.0 x 10/sup 7/ rad(Si) total-dose capability.

  17. C-MOS array design techniques

    NASA Technical Reports Server (NTRS)

    Feller, A.

    1978-01-01

    The entire complement of standard cells and components, except for the set-reset flip-flop, was completed. Two levels of checking were performed on each device. Logic cells and topological layout are described. All the related computer programs were coded and one level of debugging was completed. The logic for the test chip was modified and updated. This test chip served as the first test vehicle to exercise the standard cell complementary MOS(C-MOS) automatic artwork generation capability.

  18. Quantum Thermal Transistor

    NASA Astrophysics Data System (ADS)

    Joulain, Karl; Drevillon, Jérémie; Ezzahri, Younès; Ordonez-Miranda, Jose

    2016-05-01

    We demonstrate that a thermal transistor can be made up with a quantum system of three interacting subsystems, coupled to a thermal reservoir each. This thermal transistor is analogous to an electronic bipolar one with the ability to control the thermal currents at the collector and at the emitter with the imposed thermal current at the base. This is achieved by determining the heat fluxes by means of the strong-coupling formalism. For the case of three interacting spins, in which one of them is coupled to the other two, that are not directly coupled, it is shown that high amplification can be obtained in a wide range of energy parameters and temperatures. The proposed quantum transistor could, in principle, be used to develop devices such as a thermal modulator and a thermal amplifier in nanosystems.

  19. Self Contact Organic Transistors

    NASA Astrophysics Data System (ADS)

    Inoue, Jun-ichi; Wada, Hiroshi; Mori, Takehiko

    2010-07-01

    Thin films of various organic semiconductors, such as pentacene, sexithiophene, copper phthalocyanine, and C60, as well as an organic charge-transfer salt (TTF)(TCNQ) [TTF: tetrathiafulvalene; TCNQ: tetracyanoquinodimethane] are laser-irradiated to form conductive films, which are identified by Raman spectroscopy and atomic force microscopy to be carbon. The resulting practically transparent films are as conductive as laser-sintered carbon films and show temperature-independent conductivity. Source and drain electrodes of organic field-effect transistors are patterned by this method; in these “self-contact” transistors, both the active layers and the electrodes are derived from the same organic film. The laser-sintered carbon films are also utilized for organic single-crystal transistors based on rubrene and TCNQ.

  20. Quantum Thermal Transistor.

    PubMed

    Joulain, Karl; Drevillon, Jérémie; Ezzahri, Younès; Ordonez-Miranda, Jose

    2016-05-20

    We demonstrate that a thermal transistor can be made up with a quantum system of three interacting subsystems, coupled to a thermal reservoir each. This thermal transistor is analogous to an electronic bipolar one with the ability to control the thermal currents at the collector and at the emitter with the imposed thermal current at the base. This is achieved by determining the heat fluxes by means of the strong-coupling formalism. For the case of three interacting spins, in which one of them is coupled to the other two, that are not directly coupled, it is shown that high amplification can be obtained in a wide range of energy parameters and temperatures. The proposed quantum transistor could, in principle, be used to develop devices such as a thermal modulator and a thermal amplifier in nanosystems. PMID:27258859

  1. Influence of stoichiometry on the optical and electrical properties of chemical vapor deposition derived MoS2.

    PubMed

    Kim, In Soo; Sangwan, Vinod K; Jariwala, Deep; Wood, Joshua D; Park, Spencer; Chen, Kan-Sheng; Shi, Fengyuan; Ruiz-Zepeda, Francisco; Ponce, Arturo; Jose-Yacaman, Miguel; Dravid, Vinayak P; Marks, Tobin J; Hersam, Mark C; Lauhon, Lincoln J

    2014-10-28

    Ultrathin transition metal dichalcogenides (TMDCs) of Mo and W show great potential for digital electronics and optoelectronic applications. Whereas early studies were limited to mechanically exfoliated flakes, the large-area synthesis of 2D TMDCs has now been realized by chemical vapor deposition (CVD) based on a sulfurization reaction. The optoelectronic properties of CVD grown monolayer MoS2 have been intensively investigated, but the influence of stoichiometry on the electrical and optical properties has been largely overlooked. Here we systematically vary the stoichiometry of monolayer MoS2 during CVD via controlled sulfurization and investigate the associated changes in photoluminescence and electrical properties. X-ray photoelectron spectroscopy is employed to measure relative variations in stoichiometry and the persistence of MoOx species. As MoS2-δ is reduced (increasing δ), the field-effect mobility of monolayer transistors increases while the photoluminescence yield becomes nonuniform. Devices fabricated from monolayers with the lowest sulfur content have negligible hysteresis and a threshold voltage of ∼ 0 V. We conclude that the electrical and optical properties of monolayer MoS2 crystals can be tuned via stoichiometry engineering to meet the requirements of various applications. PMID:25223821

  2. Influence of Stoichiometry on the Optical and Electrical Properties of Chemical Vapor Deposition Derived MoS2

    PubMed Central

    2015-01-01

    Ultrathin transition metal dichalcogenides (TMDCs) of Mo and W show great potential for digital electronics and optoelectronic applications. Whereas early studies were limited to mechanically exfoliated flakes, the large-area synthesis of 2D TMDCs has now been realized by chemical vapor deposition (CVD) based on a sulfurization reaction. The optoelectronic properties of CVD grown monolayer MoS2 have been intensively investigated, but the influence of stoichiometry on the electrical and optical properties has been largely overlooked. Here we systematically vary the stoichiometry of monolayer MoS2 during CVD via controlled sulfurization and investigate the associated changes in photoluminescence and electrical properties. X-ray photoelectron spectroscopy is employed to measure relative variations in stoichiometry and the persistence of MoOx species. As MoS2−δ is reduced (increasing δ), the field-effect mobility of monolayer transistors increases while the photoluminescence yield becomes nonuniform. Devices fabricated from monolayers with the lowest sulfur content have negligible hysteresis and a threshold voltage of ∼0 V. We conclude that the electrical and optical properties of monolayer MoS2 crystals can be tuned via stoichiometry engineering to meet the requirements of various applications. PMID:25223821

  3. Lithography-free plasma-induced patterned growth of MoS2 and its heterojunction with graphene.

    PubMed

    Chen, Xiang; Park, Yong Ju; Das, Tanmoy; Jang, Houk; Lee, Jae-Bok; Ahn, Jong-Hyun

    2016-08-18

    Application-oriented patterned growth of transition metal dichalcogenides (TMDCs) and their heterojunctions is of critical importance for sophisticated, customized two-dimensional (2D) electronic and optoelectronic devices; however, it is still difficult to fabricate these patterns in a simple, clean, and high controllability manner without using optical lithography. Here, we report the direct synthesis of patterned MoS2 and graphene-MoS2 heterojunctions via selective plasma treatment of a SiO2/Si substrate and chemical vapor deposition of MoS2. This method has multiple merits, such as simple steps, a short operating time, easily isolated MoS2 layers with clean surfaces and controllable locations, shapes, sizes and thicknesses, which enable their integration into the device structure without using a photoresist. In addition, we demonstrate the direct growth of patterned graphene-MoS2 heterojunctions for the fabrication of transistor. This study reveals a novel method to fabricate and use patterned MoS2 and graphene-MoS2 heterojunctions, which could be generalized to the rational design of other 2D materials, heterojunctions and devices in the future. PMID:27432242

  4. Interpreting Transistor Noise

    NASA Astrophysics Data System (ADS)

    Pospieszalski, M. W.

    2010-10-01

    The simple noise models of field effect and bipolar transistors reviewed in this article are quite useful in engineering practice, as illustrated by measured and modeled results. The exact and approximate expressions for the noise parameters of FETs and bipolar transistors reveal certain common noise properties and some general noise properties of both devices. The usefulness of these expressions in interpreting the dependence of measured noise parameters on frequency, bias, and temperature and, consequently, in checking of consistency of measured data has been demonstrated.

  5. VOLTAGE-CONTROLLED TRANSISTOR OSCILLATOR

    DOEpatents

    Scheele, P.F.

    1958-09-16

    This patent relates to transistor oscillators and in particular to those transistor oscillators whose frequencies vary according to controlling voltages. A principal feature of the disclosed transistor oscillator circuit resides in the temperature compensation of the frequency modulating stage by the use of a resistorthermistor network. The resistor-thermistor network components are selected to have the network resistance, which is in series with the modulator transistor emitter circuit, vary with temperature to compensate for variation in the parameters of the transistor due to temperature change.

  6. Realization of Negative Capacitance with Topological Insulator Based MOS Capacitor

    NASA Astrophysics Data System (ADS)

    Yuan, Hui; Zhang, Kai; Zhu, Hao; Li, Haitao; Ioannou, Dimitris; Baumgart, Helmut; Richter, Curt; Li, Qiliang; ECE, George Mason University Team; Semiconductor and Dimensional Metrology Division of NIST Team; ECE, Old Dominion University Team

    2013-03-01

    Negative capacitance is one of way to achieve steep subthreshold slope exceeding its thermal limit in metal-oxide-semiconductor field effect transistor (MOSFET). The common materials under study for negative capacitance are ferroelectric thin films. However, the integration of regular ferroelectric materials (e.g., PZT) into semiconductor based devices is usually difficult due to the high temperature required for crystallization and precise control of oxygen percentage in ferroelectric materials. In this work, we found that negative capacitance can be achieved by introducing a topological insulator interlayer into a conventional MOS capacitor. Three-dimensional topological insulators inherently contain a insulator/semiconductor bulk and a gapless conducting surface. When an electric field is added to topological insulator interlayer, imbalanced charge carriers (electrons and holes) would be generated and then accumulate on either surface of the film, resulting in a temporary residual polarization. As a result, a ferroelectric-like hysteresis and negative capacitance are achieved. We believe this approach will be very attractive to achieve steep subthreshold using negative capacitance. Supported by NSF Career grant 0846649.

  7. A new method of VLSI conform design for MOS cells

    NASA Astrophysics Data System (ADS)

    Schmidt, K. H.; Wach, W.; Mueller-Glaser, K. D.

    An automated method for the design of specialized SSI/LSI-level MOS cells suitable for incorporation in VLSI chips is described. The method uses the symbolic-layout features of the CABBAGE computer program (Hsueh, 1979; De Man et al., 1982), but restricted by a fixed grid system to facilitate compaction procedures. The techniques used are shown to significantly speed the processes of electrical design, layout, design verification, and description for subsequent CAD/CAM application. In the example presented, a 211-transistor, parallel-load, synchronous 4-bit up/down binary counter cell was designed in 9 days, as compared to 30 days for a manually-optimized-layout version and 3 days for a larger, less efficient cell designed by a programmable logic array; the cell areas were 0.36, 0.21, and 0.79 sq mm, respectively. The primary advantage of the method is seen in the extreme ease with which the cell design can be adapted to new parameters or design rules imposed by improvements in technology.

  8. Two Dimensional Ising Superconductivity in Gated MoS2

    NASA Astrophysics Data System (ADS)

    Yuan, Noah; Lu, Jianming; Law, Kam Tuen; Zheliuk, Oleksandr; Leermakers, Inge; Zeitler, Ulrich; Ye, Jianting

    The Zeeman effect, which is usually considered to be detrimental to superconductivity, can surprisingly protect the superconducting states created by gating a layered transition metal dichalcogenide. This effective Zeeman field, which is originated from intrinsic spin orbit coupling induced by breaking in-plane inversion symmetry, can reach nearly a hundred Tesla in magnitude. It strongly pins the spin orientation of the electrons to the out-of-plane directions and protects the superconductivity from being destroyed by an in-plane external magnetic field. In magnetotransport experiments of ionic-gate MoS2 transistors, where gating prepares individual superconducting state with different carrier doping, we indeed observe a spin-protected superconductivity by measuring an in-plane critical field Bc 2 far beyond the Pauli paramagnetic limit. The gating-enhanced Bc 2 is more than an order of magnitude larger compared to the bulk superconducting phases where the effective Zeeman field is weakened by interlayer coupling. Our study gives the first experimental evidence of an Ising superconductor, in which spins of the pairing electrons are strongly pinned by an effective Zeeman field.

  9. Tunable MoS2 bandgap in MoS2-graphene heterostructures

    NASA Astrophysics Data System (ADS)

    Ebnonnasir, Abbas; Narayanan, Badri; Kodambaka, Suneel; Ciobanu, Cristian V.

    2014-07-01

    Using density functional theory calculations with van der Waals corrections, we investigated how the interlayer orientation affects the structure and electronic properties of MoS2-graphene bilayer heterostructures. Changing the orientation of graphene with respect to MoS2 strongly influences the type and the value of the electronic bandgap in MoS2, while not significantly altering the binding energy between the layers or the interlayer spacing. We show that the physical origin of this tunable bandgap arises from variations in the S-S interplanar distance (MoS2 thickness) with the interlayer orientation, variations which are caused by electron transfer away from the Mo-S bonds.

  10. Vertical organic transistors.

    PubMed

    Lüssem, Björn; Günther, Alrun; Fischer, Axel; Kasemann, Daniel; Leo, Karl

    2015-11-11

    Organic switching devices such as field effect transistors (OFETs) are a key element of future flexible electronic devices. So far, however, a commercial breakthrough has not been achieved because these devices usually lack in switching speed (e.g. for logic applications) and current density (e.g. for display pixel driving). The limited performance is caused by a combination of comparatively low charge carrier mobilities and the large channel length caused by the need for low-cost structuring. Vertical Organic Transistors are a novel technology that has the potential to overcome these limitations of OFETs. Vertical Organic Transistors allow to scale the channel length of organic transistors into the 100 nm regime without cost intensive structuring techniques. Several different approaches have been proposed in literature, which show high output currents, low operation voltages, and comparatively high speed even without sub-μm structuring technologies. In this review, these different approaches are compared and recent progress is highlighted. PMID:26466388

  11. Multimode silicon nanowire transistors.

    PubMed

    Glassner, Sebastian; Zeiner, Clemens; Periwal, Priyanka; Baron, Thierry; Bertagnolli, Emmerich; Lugstein, Alois

    2014-11-12

    The combined capabilities of both a nonplanar design and nonconventional carrier injection mechanisms are subject to recent scientific investigations to overcome the limitations of silicon metal oxide semiconductor field effect transistors. In this Letter, we present a multimode field effect transistors device using silicon nanowires that feature an axial n-type/intrinsic doping junction. A heterostructural device design is achieved by employing a self-aligned nickel-silicide source contact. The polymorph operation of the dual-gate device enabling the configuration of one p- and two n-type transistor modes is demonstrated. Not only the type but also the carrier injection mode can be altered by appropriate biasing of the two gate terminals or by inverting the drain bias. With a combined band-to-band and Schottky tunneling mechanism, in p-type mode a subthreshold swing as low as 143 mV/dec and an ON/OFF ratio of up to 10(4) is found. As the device operates in forward bias, a nonconventional tunneling transistor is realized, enabling an effective suppression of ambipolarity. Depending on the drain bias, two different n-type modes are distinguishable. The carrier injection is dominated by thermionic emission in forward bias with a maximum ON/OFF ratio of up to 10(7) whereas in reverse bias a Schottky tunneling mechanism dominates the carrier transport. PMID:25303290

  12. Radiation-hardened transistor and integrated circuit

    DOEpatents

    Ma, Kwok K.

    2007-11-20

    A composite transistor is disclosed for use in radiation hardening a CMOS IC formed on an SOI or bulk semiconductor substrate. The composite transistor has a circuit transistor and a blocking transistor connected in series with a common gate connection. A body terminal of the blocking transistor is connected only to a source terminal thereof, and to no other connection point. The blocking transistor acts to prevent a single-event transient (SET) occurring in the circuit transistor from being coupled outside the composite transistor. Similarly, when a SET occurs in the blocking transistor, the circuit transistor prevents the SET from being coupled outside the composite transistor. N-type and P-type composite transistors can be used for each and every transistor in the CMOS IC to radiation harden the IC, and can be used to form inverters and transmission gates which are the building blocks of CMOS ICs.

  13. The cryogenic MOS unit for LUCIFER

    NASA Astrophysics Data System (ADS)

    Hofmann, Reiner; Gemperlein, Hans; Grimm, Bernhard; Jutte, Marcus; Mandel, Holger; Polsterer, Kai; Weisz, Harald

    2004-09-01

    The LUCIFER MOS unit has been designed to exchange long-slit and multi-slit masks between two mask storage cabinets and the focal plane area. In combination with auxiliary cryostats, the MOS unit also permits the exchange of cold mask cabinets between LUCIFER and the auxiliary cryostats. Main functional components of the MOS unit are: a focal plane interface accepting the active mask, a mask handling unit transporting the masks between the focal plane mount and their storage locations, a stationary and an exchangeable cabinet holding 10 longslit and 23 multi-slit masks respectively, the translation drives for the exchangeable cabinet and the mask handling unit, and the mask locking unit securing the masks in their cabinets. For mask cabinet exchange, the LUCIFER cryostat as well as the auxiliary cryostats are equipped with 32 cm clear diameter gate valves. A test cryostat has been built to test all MOS unit functions at LN2 temperature. Most of the MOS unit components have been completed. System tests at ambient have started. First results are presented.

  14. Wafer-scale monolayer MoS2 grown by chemical vapor deposition using a reaction of MoO3 and H2S.

    PubMed

    Kim, Youngchan; Bark, Hunyoung; Ryu, Gyeong Hee; Lee, Zonghoon; Lee, Changgu

    2016-05-11

    Monolayer MoS2 nanosheets are potentially useful in optoelectronics, photoelectronics, and nanoelectronics due to their flexibility, mechanical strength, and direct band gap of 1.89 eV. Experimentalists have studied the synthesis of MoS2 using chemical vapor deposition (CVD) methods in an effort to fabricate wafer-scale nanofilms with a high uniformity and continuity for practical electronic applications. In this work, we applied the CVD method to a reaction of MoO3 powder and H2S gas to grow high-quality polycrystalline monolayer MoS2 sheets with unprecedented uniformity over an area of several centimeters. The monolayer MoS2 was characterized using Raman spectroscopy, photoluminescence (PL) spectroscopy, atomic force microscopy (AFM), x-ray photoemission spectroscopy (XPS), and transmission electron microscopy (TEM). The top-gate field-effect transistor prepared with a 30 nm HfO2 capping layer displayed an electrical mobility of 1 cm(2) v(-1) s(-1) and an I on/off of ~10(5). This method paves the way for the development of practical devices with MoS2 monolayers and advances fundamental research. PMID:27058779

  15. Wafer-scale monolayer MoS2 grown by chemical vapor deposition using a reaction of MoO3 and H2S

    NASA Astrophysics Data System (ADS)

    Kim, Youngchan; Bark, Hunyoung; Ryu, Gyeong Hee; Lee, Zonghoon; Lee, Changgu

    2016-05-01

    Monolayer MoS2 nanosheets are potentially useful in optoelectronics, photoelectronics, and nanoelectronics due to their flexibility, mechanical strength, and direct band gap of 1.89 eV. Experimentalists have studied the synthesis of MoS2 using chemical vapor deposition (CVD) methods in an effort to fabricate wafer-scale nanofilms with a high uniformity and continuity for practical electronic applications. In this work, we applied the CVD method to a reaction of MoO3 powder and H2S gas to grow high-quality polycrystalline monolayer MoS2 sheets with unprecedented uniformity over an area of several centimeters. The monolayer MoS2 was characterized using Raman spectroscopy, photoluminescence (PL) spectroscopy, atomic force microscopy (AFM), x-ray photoemission spectroscopy (XPS), and transmission electron microscopy (TEM). The top-gate field-effect transistor prepared with a 30 nm HfO2 capping layer displayed an electrical mobility of 1 cm2 v‑1 s‑1 and an I on/off of ~105. This method paves the way for the development of practical devices with MoS2 monolayers and advances fundamental research.

  16. Interface Properties of Atomic-Layer-Deposited Al2O3 Thin Films on Ultraviolet/Ozone-Treated Multilayer MoS2 Crystals.

    PubMed

    Park, Seonyoung; Kim, Seong Yeoul; Choi, Yura; Kim, Myungjun; Shin, Hyunjung; Kim, Jiyoung; Choi, Woong

    2016-05-11

    We report the interface properties of atomic-layer-deposited Al2O3 thin films on ultraviolet/ozone (UV/O3)-treated multilayer MoS2 crystals. The formation of S-O bonds on MoS2 after low-power UV/O3 treatment increased the surface energy, allowing the subsequent deposition of uniform Al2O3 thin films. The capacitance-voltage measurement of Au-Al2O3-MoS2 metal oxide semiconductor capacitors indicated n-type MoS2 with an electron density of ∼10(17) cm(-3) and a minimum interface trap density of ∼10(11) cm(-2) eV(-1). These results demonstrate the possibility of forming a high-quality Al2O3-MoS2 interface by proper UV/O3 treatment, providing important implications for their integration into field-effect transistors. PMID:27117229

  17. Environmental Effects on Hysteresis of Transfer Characteristics in Molybdenum Disulfide Field-Effect Transistors.

    PubMed

    Shimazu, Yoshihiro; Tashiro, Mitsuki; Sonobe, Satoshi; Takahashi, Masaki

    2016-01-01

    Molybdenum disulfide (MoS2) has recently received much attention for nanoscale electronic and photonic applications. To explore the intrinsic properties and enhance the performance of MoS2-based field-effect transistors, thorough understanding of extrinsic effects such as environmental gas and contact resistance of the electrodes is required. Here, we report the effects of environmental gases on the transport properties of back-gated multilayered MoS2 field-effect transistors. Comparisons between different gases (oxygen, nitrogen, and air and nitrogen with varying relative humidities) revealed that water molecules acting as charge-trapping centers are the main cause of hysteresis in the transfer characteristics. While the hysteresis persisted even after pumping out the environmental gas for longer than 10 h at room temperature, it disappeared when the device was cooled to 240 K, suggesting a considerable increase in the time constant of the charge trapping/detrapping at these modestly low temperatures. The suppression of the hysteresis or instability in the easily attainable temperature range without surface passivation is highly advantageous for the device application of this system. The humidity dependence of the threshold voltages in the transfer curves indicates that the water molecules dominantly act as hole-trapping centers. A strong dependence of the on-state current on oxygen pressure was also observed. PMID:27435309

  18. Environmental Effects on Hysteresis of Transfer Characteristics in Molybdenum Disulfide Field-Effect Transistors

    PubMed Central

    Shimazu, Yoshihiro; Tashiro, Mitsuki; Sonobe, Satoshi; Takahashi, Masaki

    2016-01-01

    Molybdenum disulfide (MoS2) has recently received much attention for nanoscale electronic and photonic applications. To explore the intrinsic properties and enhance the performance of MoS2-based field-effect transistors, thorough understanding of extrinsic effects such as environmental gas and contact resistance of the electrodes is required. Here, we report the effects of environmental gases on the transport properties of back-gated multilayered MoS2 field-effect transistors. Comparisons between different gases (oxygen, nitrogen, and air and nitrogen with varying relative humidities) revealed that water molecules acting as charge-trapping centers are the main cause of hysteresis in the transfer characteristics. While the hysteresis persisted even after pumping out the environmental gas for longer than 10 h at room temperature, it disappeared when the device was cooled to 240 K, suggesting a considerable increase in the time constant of the charge trapping/detrapping at these modestly low temperatures. The suppression of the hysteresis or instability in the easily attainable temperature range without surface passivation is highly advantageous for the device application of this system. The humidity dependence of the threshold voltages in the transfer curves indicates that the water molecules dominantly act as hole-trapping centers. A strong dependence of the on-state current on oxygen pressure was also observed. PMID:27435309

  19. Environmental Effects on Hysteresis of Transfer Characteristics in Molybdenum Disulfide Field-Effect Transistors

    NASA Astrophysics Data System (ADS)

    Shimazu, Yoshihiro; Tashiro, Mitsuki; Sonobe, Satoshi; Takahashi, Masaki

    2016-07-01

    Molybdenum disulfide (MoS2) has recently received much attention for nanoscale electronic and photonic applications. To explore the intrinsic properties and enhance the performance of MoS2-based field-effect transistors, thorough understanding of extrinsic effects such as environmental gas and contact resistance of the electrodes is required. Here, we report the effects of environmental gases on the transport properties of back-gated multilayered MoS2 field-effect transistors. Comparisons between different gases (oxygen, nitrogen, and air and nitrogen with varying relative humidities) revealed that water molecules acting as charge-trapping centers are the main cause of hysteresis in the transfer characteristics. While the hysteresis persisted even after pumping out the environmental gas for longer than 10 h at room temperature, it disappeared when the device was cooled to 240 K, suggesting a considerable increase in the time constant of the charge trapping/detrapping at these modestly low temperatures. The suppression of the hysteresis or instability in the easily attainable temperature range without surface passivation is highly advantageous for the device application of this system. The humidity dependence of the threshold voltages in the transfer curves indicates that the water molecules dominantly act as hole-trapping centers. A strong dependence of the on-state current on oxygen pressure was also observed.

  20. MoS₂ field-effect transistor for next-generation label-free biosensors.

    PubMed

    Sarkar, Deblina; Liu, Wei; Xie, Xuejun; Anselmo, Aaron C; Mitragotri, Samir; Banerjee, Kaustav

    2014-04-22

    Biosensors based on field-effect transistors (FETs) have attracted much attention, as they offer rapid, inexpensive, and label-free detection. While the low sensitivity of FET biosensors based on bulk 3D structures has been overcome by using 1D structures (nanotubes/nanowires), the latter face severe fabrication challenges, impairing their practical applications. In this paper, we introduce and demonstrate FET biosensors based on molybdenum disulfide (MoS2), which provides extremely high sensitivity and at the same time offers easy patternability and device fabrication, due to its 2D atomically layered structure. A MoS2-based pH sensor achieving sensitivity as high as 713 for a pH change by 1 unit along with efficient operation over a wide pH range (3-9) is demonstrated. Ultrasensitive and specific protein sensing is also achieved with a sensitivity of 196 even at 100 femtomolar concentration. While graphene is also a 2D material, we show here that it cannot compete with a MoS2-based FET biosensor, which surpasses the sensitivity of that based on graphene by more than 74-fold. Moreover, we establish through theoretical analysis that MoS2 is greatly advantageous for biosensor device scaling without compromising its sensitivity, which is beneficial for single molecular detection. Furthermore, MoS2, with its highly flexible and transparent nature, can offer new opportunities in advanced diagnostics and medical prostheses. This unique fusion of desirable properties makes MoS2 a highly potential candidate for next-generation low-cost biosensors. PMID:24588742

  1. Measurement and Analysis of a Ferroelectric Field-Effect Transistor NAND Gate

    NASA Technical Reports Server (NTRS)

    Phillips, Thomas A.; MacLeond, Todd C.; Sayyah, Rana; Ho, Fat Duen

    2009-01-01

    Previous research investigated expanding the use of Ferroelectric Field-Effect Transistors (FFET) to other electronic devices beyond memory circuits. Ferroelectric based transistors possess unique characteris tics that give them interesting and useful properties in digital logic circuits. The NAND gate was chosen for investigation as it is one of the fundamental building blocks of digital electronic circuits. In t his paper, NAND gate circuits were constructed utilizing individual F FETs. N-channel FFETs with positive polarization were used for the standard CMOS NAND gate n-channel transistors and n-channel FFETs with n egative polarization were used for the standard CMOS NAND gate p-chan nel transistors. The voltage transfer curves were obtained for the NA ND gate. Comparisons were made between the actual device data and the previous modeled data. These results are compared to standard MOS logic circuits. The circuits analyzed are not intended to be fully opera tional circuits that would interface with existing logic circuits, bu t as a research tool to look into the possibility of using ferroelectric transistors in future logic circuits. Possible applications for th ese devices are presented, and their potential benefits and drawbacks are discussed.

  2. High-Current Gain Two-Dimensional MoS₂-Base Hot-Electron Transistors.

    PubMed

    Torres, Carlos M; Lan, Yann-Wen; Zeng, Caifu; Chen, Jyun-Hong; Kou, Xufeng; Navabi, Aryan; Tang, Jianshi; Montazeri, Mohammad; Adleman, James R; Lerner, Mitchell B; Zhong, Yuan-Liang; Li, Lain-Jong; Chen, Chii-Dong; Wang, Kang L

    2015-12-01

    The vertical transport of nonequilibrium charge carriers through semiconductor heterostructures has led to milestones in electronics with the development of the hot-electron transistor. Recently, significant advances have been made with atomically sharp heterostructures implementing various two-dimensional materials. Although graphene-base hot-electron transistors show great promise for electronic switching at high frequencies, they are limited by their low current gain. Here we show that, by choosing MoS2 and HfO2 for the filter barrier interface and using a noncrystalline semiconductor such as ITO for the collector, we can achieve an unprecedentedly high-current gain (α ∼ 0.95) in our hot-electron transistors operating at room temperature. Furthermore, the current gain can be tuned over 2 orders of magnitude with the collector-base voltage albeit this feature currently presents a drawback in the transistor performance metrics such as poor output resistance and poor intrinsic voltage gain. We anticipate our transistors will pave the way toward the realization of novel flexible 2D material-based high-density, low-energy, and high-frequency hot-carrier electronic applications. PMID:26524388

  3. Improved chopper circuit uses parallel transistors

    NASA Technical Reports Server (NTRS)

    1966-01-01

    Parallel transistor chopper circuit operates with one transistor in the forward mode and the other in the inverse mode. By using this method, it acts as a single, symmetrical, bidirectional transistor, and reduces and stabilizes the offset voltage.

  4. Hybrid Flexible Resistive Random Access Memory-Gated Transistor for Novel Nonvolatile Data Storage.

    PubMed

    Han, Su-Ting; Zhou, Ye; Chen, Bo; Wang, Chundong; Zhou, Li; Yan, Yan; Zhuang, Jiaqing; Sun, Qijun; Zhang, Hua; Roy, V A L

    2016-01-20

    Here, a single-device demonstration of novel hybrid architecture is reported to achieve programmable transistor nodes which have analogies to flash memory by incorporating a resistive switching random access memory (RRAM) device as a resistive switch gate for field effect transistor (FET) on a flexible substrate. A high performance flexible RRAM with a three-layered structure is fabricated by utilizing solution-processed MoS2 nanosheets sandwiched between poly(methyl methacrylate) polymer layers. Gate coupling with the pentacene-based transistor can be controlled by the RRAM memory state to produce a nonprogrammed state (inactive) and a programmed state (active) with a well-defined memory window. Compared to the reference flash memory device based on the MoS2 floating gate, the hybrid device presents robust access speed and retention ability. Furthermore, the hybrid RRAM-gated FET is used to build an integrated logic circuit and a wide logic window in inverter logic is achieved. The controllable, well-defined memory window, long retention time, and fast access speed of this novel hybrid device may open up new possibilities of realizing fully functional nonvolatile memory for high-performance flexible electronics. PMID:26578160

  5. Ion bipolar junction transistors.

    PubMed

    Tybrandt, Klas; Larsson, Karin C; Richter-Dahlfors, Agneta; Berggren, Magnus

    2010-06-01

    Dynamic control of chemical microenvironments is essential for continued development in numerous fields of life sciences. Such control could be achieved with active chemical circuits for delivery of ions and biomolecules. As the basis for such circuitry, we report a solid-state ion bipolar junction transistor (IBJT) based on conducting polymers and thin films of anion- and cation-selective membranes. The IBJT is the ionic analogue to the conventional semiconductor BJT and is manufactured using standard microfabrication techniques. Transistor characteristics along with a model describing the principle of operation, in which an anionic base current amplifies a cationic collector current, are presented. By employing the IBJT as a bioelectronic circuit element for delivery of the neurotransmitter acetylcholine, its efficacy in modulating neuronal cell signaling is demonstrated. PMID:20479274

  6. Ion bipolar junction transistors

    PubMed Central

    Tybrandt, Klas; Larsson, Karin C.; Richter-Dahlfors, Agneta; Berggren, Magnus

    2010-01-01

    Dynamic control of chemical microenvironments is essential for continued development in numerous fields of life sciences. Such control could be achieved with active chemical circuits for delivery of ions and biomolecules. As the basis for such circuitry, we report a solid-state ion bipolar junction transistor (IBJT) based on conducting polymers and thin films of anion- and cation-selective membranes. The IBJT is the ionic analogue to the conventional semiconductor BJT and is manufactured using standard microfabrication techniques. Transistor characteristics along with a model describing the principle of operation, in which an anionic base current amplifies a cationic collector current, are presented. By employing the IBJT as a bioelectronic circuit element for delivery of the neurotransmitter acetylcholine, its efficacy in modulating neuronal cell signaling is demonstrated. PMID:20479274

  7. Chemoresponsive Monolayer Transistors

    SciTech Connect

    Guo,X.; Myers, M.; Xiao, S.; Lefenfeld, M.; Steiner, R.; Tulevski, G.; Tang, J.; Baumert, J.; Leibfarth, F.; et al.

    2006-01-01

    This work details a method to make efficacious field-effect transistors from monolayers of polycyclic aromatic hydrocarbons that are able to sense and respond to their chemical environment. The molecules used in this study are functionalized so that they assemble laterally into columns and attach themselves to the silicon oxide surface of a silicon wafer. To measure the electrical properties of these monolayers, we use ultrasmall point contacts that are separated by only a few nanometers as the source and drain electrodes. These contacts are formed through an oxidative cutting of an individual metallic single-walled carbon nanotube that is held between macroscopic metal leads. The molecules assemble in the gap and form transistors with large current modulation and high gate efficiency. Because these devices are formed from an individual stack of molecules, their electrical properties change significantly when exposed to electron-deficient molecules such as tetracyanoquinodimethane (TCNQ), forming the basis for new types of environmental and molecular sensors.

  8. TRANSISTOR HIGH VOLTAGE POWER SUPPLY

    DOEpatents

    Driver, G.E.

    1958-07-15

    High voltage, direct current power supplies are described for use with battery powered nuclear detection equipment. The particular advantages of the power supply described, are increased efficiency and reduced size and welght brought about by the use of transistors in the circuit. An important feature resides tn the employment of a pair of transistors in an alternatefiring oscillator circuit having a coupling transformer and other circuit components which are used for interconnecting the various electrodes of the transistors.

  9. Polarization induced doped transistor

    DOEpatents

    Xing, Huili; Jena, Debdeep; Nomoto, Kazuki; Song, Bo; Zhu, Mingda; Hu, Zongyang

    2016-06-07

    A nitride-based field effect transistor (FET) comprises a compositionally graded and polarization induced doped p-layer underlying at least one gate contact and a compositionally graded and doped n-channel underlying a source contact. The n-channel is converted from the p-layer to the n-channel by ion implantation, a buffer underlies the doped p-layer and the n-channel, and a drain underlies the buffer.

  10. Wafer-scale synthesis of thickness-controllable MoS2 films via solution-processing using a dimethylformamide/n-butylamine/2-aminoethanol solvent system

    NASA Astrophysics Data System (ADS)

    Yang, Jaehyun; Gu, Yeahyun; Lee, Eunha; Lee, Hyangsook; Park, Sang Han; Cho, Mann-Ho; Kim, Yong Ho; Kim, Yong-Hoon; Kim, Hyoungsub

    2015-05-01

    The wafer-scale synthesis of two-dimensional molybdenum disulfide (MoS2) films, with high layer-controllability and uniformity, remains a significant challenge in the fields of nano and optoelectronics. Here, we report the highly thickness controllable growth of uniform MoS2 thin films on the wafer-scale via a spin-coating route. Formulation of a dimethylformamide-based MoS2 precursor solution mixed with additional amine- and amino alcohol-based solvents (n-butylamine and 2-aminoethanol) allowed for the formation of a uniform coating of MoS2 thin films over a 2 inch wafer-scale SiO2/Si substrate. In addition, facile control of the average number of stacking layers is demonstrated by simply manipulating the concentration of the precursor solution. Various characterization results reveal that the synthesized MoS2 film has wafer-scale homogeneity with excellent crystalline quality and a stoichiometric chemical composition. To further demonstrate possible device applications, a mostly penta-layered MoS2 thin film was integrated into a top-gated field-effect transistor as the channel layer and we also successfully transferred our films onto transparent/flexible substrates.The wafer-scale synthesis of two-dimensional molybdenum disulfide (MoS2) films, with high layer-controllability and uniformity, remains a significant challenge in the fields of nano and optoelectronics. Here, we report the highly thickness controllable growth of uniform MoS2 thin films on the wafer-scale via a spin-coating route. Formulation of a dimethylformamide-based MoS2 precursor solution mixed with additional amine- and amino alcohol-based solvents (n-butylamine and 2-aminoethanol) allowed for the formation of a uniform coating of MoS2 thin films over a 2 inch wafer-scale SiO2/Si substrate. In addition, facile control of the average number of stacking layers is demonstrated by simply manipulating the concentration of the precursor solution. Various characterization results reveal that the

  11. GaN Metal Oxide Semiconductor Field Effect Transistors

    SciTech Connect

    Ren, F.; Pearton, S.J.; Abernathy, C.R.; Baca, A.; Cheng, P.; Shul, R.J.; Chu, S.N.G.; Hong, M.; Lothian, J.R.; Schurman, M.J.

    1999-03-02

    A GaN based depletion mode metal oxide semiconductor field effect transistor (MOSFET) was demonstrated using Ga{sub 2}O{sub 3}(Gd{sub 2}O{sub 3}) as the gate dielectric. The MOS gate reverse breakdown voltage was > 35V which was significantly improved from 17V of Pt Schottky gate on the same material. A maximum extrinsic transconductance of 15 mS/mm was obtained at V{sub ds} = 30 V and device performance was limited by the contact resistance. A unity current gain cut-off frequency, f{sub {tau}}, and maximum frequency of oscillation, f{sub max} of 3.1 and 10.3 GHz, respectively, were measured at V{sub ds} = 25 V and V{sub gs} = {minus}20 V.

  12. Speed enhancement of complementary MOS devices

    NASA Technical Reports Server (NTRS)

    Devlin, M.

    1972-01-01

    Speed required for Sisyphus experiment on Pioneer probe was attained at supply voltage well within component limitations by combining supply voltage higher than nominal with low reactance interconnections. Speed was found to be far in excess of typical. parameters suggested by manufacturers of MOS devices.

  13. Superconducting Field-Effect Transistors

    NASA Technical Reports Server (NTRS)

    Bhasin, Kul; Romanofsky, Robert R.; Tabib-Azar, Massood

    1995-01-01

    Devices offer switching speeds greater than semiconducting counterparts. High-Tc superconducting field-effect transistors (SUPEFETs) investigated for use as electronic switches in delay-line-type microwave phase shifters. Resemble semiconductor field-effect transistors in some respects, but their operation based on different principle; namely, electric-field control of transition between superconductivity and normal conductivity.

  14. Graphene - ferroelectric and MoS2 - ferroelectric heterostructures for memory applications

    NASA Astrophysics Data System (ADS)

    Lipatov, Alexey; Sharma, Pankaj; Gruverman, Alexei; Sinitskii, Alexander

    In recent years there has been an unprecedented interest in two-dimensional (2D) materials with unique physical and chemical properties that cannot be found in their three-dimensional (3D) counterparts. One of the important advantages of 2D materials is that they can be easily integrated with other 2D materials and functional films, resulting in multilayered structures with new properties. We fabricated and tested electronic and memory properties of field-effect transistors (FETs) based on a single-layer graphene combined with lead zirconium titanate (PZT) substrate. Previously studied graphene-PZT devices exhibited an unusual electronic behavior such as clockwise hysteresis of electronic transport, in contradiction with counterclockwise polarization dependence of PZT. We investigated how the interplay of polarization and interfacial phenomena affects the electronic behavior and memory characteristics of graphene-PZT FETs, explain the origin of unusual clockwise hysteresis and experimentally demonstrate a reversed polarization-dependent hysteresis of electronic transport. In addition we fabricated and tested properties of MoS2-PZT FETs which exhibit a large hysteresis of electronic transport with high ON/OFF ratios. We demonstrate that MoS2-PZT memories have a number of advantages over commercial FeRAMs, such as nondestructive data readout, low operation voltage, wide memory window and the possibility to write and erase them both electrically and optically.

  15. Enhanced mobility electrons at the monolayer / multilayer MoS2 homo-interface

    NASA Astrophysics Data System (ADS)

    Jia, Y.; Lenferink, E. J.; Stanev, T.; Stern, N. P.

    2015-03-01

    Energy band alignment at interface of heterostructures can give rise to non-trivial local electronic structure and charge states with low dimensionality. In transition metal dichalcogenides (TMDCs), the optical band gap depends on the number of 2D crystal layers, transitioning from 1.29 eV in bulk to 1.88 eV for a monolayer of MoS2, for example, and providing the possibility to create unusual charge state at the monolayer/multilayer homo-interface. Here, we examine the boundaries between MoS2 monolayers and multilayers using scanning photocurrent microscopy and gate-dependent transport. Enhanced photocurrent and conductance were observed at the 1D homo-interface, which can be explained as accumulated carriers in the bent-band region of the junction. Our heterojunction modeling suggests a high local carrier density and enhanced mobility at the homo-interface. Our work presents an opportunity to achieve a 1D electron state in a homojunction and a pathway to break the mobility limit of TMDC monolayer transistors. This work was supported by the Institute for Sustainability and Energy at Northwestern and the U.S. Department of Energy (DE-SC0012130). N.P.S. acknowledges support as an Alfred P. Sloan Research Fellow.

  16. Electronic properties of MoS2 sandwiched between graphene monolayers

    NASA Astrophysics Data System (ADS)

    Shao, Li; Chen, Guangde; Ye, Honggang; Wu, Yelong; Niu, Haibo; Zhu, Youzhang

    2014-05-01

    The effect of an electric field on the electronic properties of a MoS2 monolayer between two graphene sheets (G/MoS2/G) is investigated within the framework of density functional theory. We show that the positive and negative electronic field applied in the direction perpendicular to the G/MoS2/G superlattice significantly modifies the electronic structure of the whole system, which can allow to control the values of the energy gap. It is shown that the energy dispersions are nearly linear in the vicinity of the Fermi level with and without external field. We elucidate the mechanism for the gap tuning by examining the projected density of states of C atoms and charge redistribution within graphene and charge transfer between graphene and MoS2 layers driven by the electric field. These findings are a useful complement to experimental studies of the G/MoS2/G system and provide a theoretical explanation for the extraordinary performance of this superlattice for fast speed and high on-off switching transistor.

  17. From transistor to nanotube

    NASA Astrophysics Data System (ADS)

    Boudenot, Jean-Claude

    2008-01-01

    We present here the main steps in the evolution of the transistor, since the tremendous invention of such a device and the introduction of the integrated circuit. We will then recall the main steps of Moore's law development. Nanotechnology began at the very beginning of the 21st century. Two aspects are presented in this article: the first, called 'More Moore', consists in continuing the laws of scale up to the physical limits; the second aspect, called 'beyond CMOS' explores new concepts such as spintronics, moletronics, nanotronics and other types of molecular electronics. To cite this article: J.-C. Boudenot, C. R. Physique 9 (2008).

  18. Power transistor switching characterization

    NASA Technical Reports Server (NTRS)

    Blackburn, D. L.

    1981-01-01

    The switching properties of power transistors are investigated. The devices studied were housed in IO-3 cases and were of an n(+)-p-n(-)-n(+) vertical dopant structure. The effects of the magnitude of the reverse-base current and temperature on the reverse-bias second breakdown characteristics are discussed. Brief discussions of device degradation due to second breakdown and of a constant voltage turn-off circuit are included. A description of a vacuum tube voltage clamp circuit which reduces clamped collector voltage overshoot is given.

  19. REGENERATIVE TRANSISTOR AMPLIFIER

    DOEpatents

    Kabell, L.J.

    1958-11-25

    Electrical circults for use in computers and the like are described. particularly a regenerative bistable transistor amplifler which is iurned on by a clock signal when an information signal permits and is turned off by the clock signal. The amplifier porforms the above function with reduced power requirements for the clock signal and circuit operation. The power requirements are reduced in one way by employing transformer coupling which increases the collector circuit efficiency by eliminating the loss of power in the collector load resistor.

  20. Bulk-barrier transistor

    NASA Astrophysics Data System (ADS)

    Mader, H.; Mueller, R.; Beinvogl, W.

    1983-10-01

    Experimental and theoretical results are presented on a bulk-barrier transistor (BBT). In this device the charge-carrier transportation is determined by an energy barrier, which is located inside a semiconductor. The barrier is the result of a space-charge region in a three-layered n-p-n or p-n-p structure with a very thin middle layer. The height of the energy barrier, which is adjustable by technological parameters, can be controlled by an external voltage.

  1. The coupled atom transistor.

    PubMed

    Jehl, X; Voisin, B; Roche, B; Dupont-Ferrier, E; De Franceschi, S; Sanquer, M; Cobian, M; Niquet, Y-M; Sklénard, B; Cueto, O; Wacquez, R; Vinet, M

    2015-04-22

    We describe the first implementation of a coupled atom transistor where two shallow donors (P or As) are implanted in a nanoscale silicon nanowire and their electronic levels are controlled with three gate voltages. Transport spectroscopy through these donors placed in series is performed both at zero and microwave frequencies. The coherence of the charge transfer between the two donors is probed by Landau-Zener-Stückelberg interferometry. Single-charge transfer at zero bias (electron pumping) has been performed and the crossover between the adiabatic and non-adiabatic regimes is studied. PMID:25783566

  2. The coupled atom transistor

    NASA Astrophysics Data System (ADS)

    Jehl, X.; Voisin, B.; Roche, B.; Dupont-Ferrier, E.; De Franceschi, S.; Sanquer, M.; Cobian, M.; Niquet, Y.-M.; Sklénard, B.; Cueto, O.; Wacquez, R.; Vinet, M.

    2015-04-01

    We describe the first implementation of a coupled atom transistor where two shallow donors (P or As) are implanted in a nanoscale silicon nanowire and their electronic levels are controlled with three gate voltages. Transport spectroscopy through these donors placed in series is performed both at zero and microwave frequencies. The coherence of the charge transfer between the two donors is probed by Landau-Zener-Stückelberg interferometry. Single-charge transfer at zero bias (electron pumping) has been performed and the crossover between the adiabatic and non-adiabatic regimes is studied.

  3. Analysis and optimisation of lateral thin-film silicon-on-insulator (SOI) PMOS transistor with an NBL layer in the drift region

    NASA Astrophysics Data System (ADS)

    Cortés, I.; Toulon, G.; Morancho, F.; Flores, D.; Hugonnard-Bruyère, E.; Villard, B.

    2012-04-01

    This paper analyses the experimental results of voltage capability (VBR > 120 V) and output characteristics of a new lateral power P-channel MOS transistors manufactured on a 0.18 μm SOI CMOS technology by means of TCAD numerical simulations. The proposed LDPMOS structures have an N-type buried layer (NBL) inserted in the P-well drift region with the purpose of increasing the RESURF effectiveness and improving the static characteristics (Ron-sp/VBR trade-off) and the device switching performance. Some architecture modifications are also proposed in this paper to further improve the performance of fabricated transistors.

  4. Flexible integrated circuits and multifunctional electronics based on single atomic layers of MoS2 and graphene.

    PubMed

    Amani, Matin; Burke, Robert A; Proie, Robert M; Dubey, Madan

    2015-03-20

    Two-dimensional materials, such as graphene and its analogues, have been investigated by numerous researchers for high performance flexible and conformal electronic systems, because they offer the ultimate level of thickness scaling, atomically smooth surfaces and high crystalline quality. Here, we use layer-by-layer transfer of large area molybdenum disulphide (MoS2) and graphene grown by chemical vapor deposition (CVD) to demonstrate electronics on flexible polyimide (PI) substrates. On the same PI substrate, we are able to simultaneously fabricate MoS2 based logic, non-volatile memory cells with graphene floating gates, photo-detectors and MoS2 transistors with tunable source and drain contacts. We are also able to demonstrate that these flexible heterostructure devices have very high electronic performance, comparable to four point measurements taken on SiO2 substrates, with on/off ratios >10(7) and field effect mobilities as high as 16.4 cm(2) V(-1) s(-1). Additionally, the heterojunctions show high optoelectronic sensitivity and were operated as photodetectors with responsivities over 30 A W(-1). Through local gating of the individual graphene/MoS2 contacts, we are able to tune the contact resistance over the range of 322-1210 Ω mm for each contact, by modulating the graphene work function. This leads to devices with tunable and multifunctional performance that can be implemented in a conformable platform. PMID:25709100

  5. Flexible integrated circuits and multifunctional electronics based on single atomic layers of MoS2 and graphene

    NASA Astrophysics Data System (ADS)

    Amani, Matin; Burke, Robert A.; Proie, Robert M.; Dubey, Madan

    2015-03-01

    Two-dimensional materials, such as graphene and its analogues, have been investigated by numerous researchers for high performance flexible and conformal electronic systems, because they offer the ultimate level of thickness scaling, atomically smooth surfaces and high crystalline quality. Here, we use layer-by-layer transfer of large area molybdenum disulphide (MoS2) and graphene grown by chemical vapor deposition (CVD) to demonstrate electronics on flexible polyimide (PI) substrates. On the same PI substrate, we are able to simultaneously fabricate MoS2 based logic, non-volatile memory cells with graphene floating gates, photo-detectors and MoS2 transistors with tunable source and drain contacts. We are also able to demonstrate that these flexible heterostructure devices have very high electronic performance, comparable to four point measurements taken on SiO2 substrates, with on/off ratios >107 and field effect mobilities as high as 16.4 cm2 V-1 s-1. Additionally, the heterojunctions show high optoelectronic sensitivity and were operated as photodetectors with responsivities over 30 A W-1. Through local gating of the individual graphene/MoS2 contacts, we are able to tune the contact resistance over the range of 322-1210 Ω mm for each contact, by modulating the graphene work function. This leads to devices with tunable and multifunctional performance that can be implemented in a conformable platform.

  6. Effects of the dielectric environment on the electron transport properties of single-layer MoS2

    NASA Astrophysics Data System (ADS)

    Bertolazzi, Simone; Allain, Adrien; Lembke, Dominik; Kis, Andras

    2014-03-01

    Two-dimensional materials, such as graphene, boron nitride and transition metal dichalcogenides, offer a wide range of electronic, optical and mechanical properties that can be advantageous for several applications in nanotechnology. Among these materials, single-layer molybdenum disulfide (MoS2) shows great potential for scaling field-effect transistor devices, due to an optimal electrostatic control of the 2D semiconducting sheet, large energy bandgap and minimal leakage currents. However, to fully exploit the potential of this atomically thin semiconductor, additional experimental efforts need to be undertaken to boost the device performance and access the theoretical intrinsic electron mobilities. To pursue this objective, it is mandatory to reduce the density of charged impurities, both in the semiconducting sheet and in its surrounding environment, and to limit carrier scattering induced by polar optical phonons in the dielectric surface. Here we present the results of our recent experimental investigation of the electron transport properties of single-layer MoS2 mechanically exfoliated/transferred onto different substrates, with varying surface chemistry, surface roughness and dielectric permittivity. We will show temperature-dependent four-terminal measurements of the electrical conductivity of single-layer MoS2 in contact with various insulating materials, including 2D sheets of hexagonal boron nitride, organic polymers and metal oxides.

  7. Temperature-dependent characteristics of AlGaN/GaN FinFETs with sidewall MOS channel

    NASA Astrophysics Data System (ADS)

    Im, Ki-Sik; Kang, Hee-Sung; Kim, Do-Kywn; Vodapally, Sindhuri; Park, YoHan; Lee, Jae-Hoon; Kim, Yong-Tae; Cristoloveanu, Sorin; Lee, Jung-Hee

    2016-06-01

    AlGaN/GaN fin-shaped field-effect transistors (FinFETs) with variable fin width have been fabricated and characterized. Low-temperature measurements reveal distinct operation modes for wide FinFET, narrow FinFET and planar FET. The wide fin device exhibits broad transconductance (gm) that decreases sublinearly with increasing temperature due to the existence of the sidewall metal-oxide-semiconductor (MOS) channel. By comparison, the conventional planar AlGaN/GaN metal-insulator-semiconductor heterostructure FET (MISHFET) features relatively narrow gm curve and near-exponentially decay of gm with temperature. The effect of the sidewall channel becomes more prominent for the narrow fin device and leads to two distinct gm peaks. The first peak at negative gate voltage corresponds to the two-dimensional electron gas (2-DEG) channel, while the second peak at positive gate voltage is related to the sidewall MOS channel. Measurements also show that the electrons in 2-DEG channel experience polar-optical-phonon scattering unlike the electrons in the sidewall MOS channel which are mainly subject to Coulomb scattering.

  8. Investigation of MOS Interfaces with Atomic-Layer-Deposited High-k Gate Dielectrics on III-V Semiconductors

    NASA Astrophysics Data System (ADS)

    Suri, Rahul

    The purpose of this research work was to investigate the surface passivation methods and metal gate/high-k dielectric gate stacks for metal-oxide-semiconductor devices (MOS) on III-V compound semiconductor materials -- (i) GaAs for future high-speed low-power logic devices and (ii) AlGaN/GaN heterostructure for future high-speed high-power devices. GaAs is a candidate material for high-mobility channel in a NMOS transistor to extend the CMOS scaling up to and beyond the 16-nm technology node. AlGaN/GaN heterostructure is useful in a MOS-high electron mobility transistor (MOS-HEMT) device for providing a high current-carrying two dimensional electron gas (2DEG) channel. The interaction of GaAs surface with atomic layer deposition of high- k dielectrics was investigated to gain fundamental insights into the chemical properties of GaAs surface oxides and high-k/GaAs interface. Electrical characterization of devices was performed to understand the impact of high-k/GaAs interface on MOS device characteristics in order to form a suitable metal/high-k/GaAs gatestack for future high-speed logic and power devices. Reduction of native oxides on GaAs was found to occur during atomic layer deposition (ALD) of high-k dielectrics- HfO2 and Al2O3/HfO 2 nanolaminates on GaAs. Reaction between ALD metal precursor and native oxides on GaAs was identified to be the cause for consumption of native oxides. It was established that the ALD growth temperature has a strong impact on this phenomenon. During post-dielectric annealing the residual arsenic oxides at the interface decomposed leading to an increase in the interfacial gallium oxides. Presence of gallium oxide, Ga2O3 was identified as a cause for observed frequency dispersion in MOS capacitance-voltage curves indicative of a high interface state density. The chemical properties of the AlGaN/GaN heterostructure surface prepared by wet chemical treatment using HCl/HF and NH4OH solutions were investigated and compared. Both HCl and

  9. A hybrid nanomemristor/transistor logic circuit capable of self-programming.

    PubMed

    Borghetti, Julien; Li, Zhiyong; Straznicky, Joseph; Li, Xuema; Ohlberg, Douglas A A; Wu, Wei; Stewart, Duncan R; Williams, R Stanley

    2009-02-10

    Memristor crossbars were fabricated at 40 nm half-pitch, using nanoimprint lithography on the same substrate with Si metal-oxide-semiconductor field effect transistor (MOS FET) arrays to form fully integrated hybrid memory resistor (memristor)/transistor circuits. The digitally configured memristor crossbars were used to perform logic functions, to serve as a routing fabric for interconnecting the FETs and as the target for storing information. As an illustrative demonstration, the compound Boolean logic operation (A AND B) OR (C AND D) was performed with kilohertz frequency inputs, using resistor-based logic in a memristor crossbar with FET inverter/amplifier outputs. By routing the output signal of a logic operation back onto a target memristor inside the array, the crossbar was conditionally configured by setting the state of a nonvolatile switch. Such conditional programming illuminates the way for a variety of self-programmed logic arrays, and for electronic synaptic computing. PMID:19171903

  10. Interfacial n-Doping Using an Ultrathin TiO2 Layer for Contact Resistance Reduction in MoS2.

    PubMed

    Kaushik, Naveen; Karmakar, Debjani; Nipane, Ankur; Karande, Shruti; Lodha, Saurabh

    2016-01-13

    We demonstrate a low and constant effective Schottky barrier height (ΦB ∼ 40 meV) irrespective of the metal work function by introducing an ultrathin TiO2 ALD interfacial layer between various metals (Ti, Ni, Au, and Pd) and MoS2. Transmission line method devices with and without the contact TiO2 interfacial layer on the same MoS2 flake demonstrate reduced (24×) contact resistance (RC) in the presence of TiO2. The insertion of TiO2 at the source-drain contact interface results in significant improvement in the on-current and field effect mobility (up to 10×). The reduction in RC and ΦB has been explained through interfacial doping of MoS2 and validated by first-principles calculations, which indicate metallic behavior of the TiO2-MoS2 interface. Consistent with DFT results of interfacial doping, X-ray photoelectron spectroscopy (XPS) data also exhibit a 0.5 eV shift toward higher binding energies for Mo 3d and S 2p peaks in the presence of TiO2, indicating Fermi level movement toward the conduction band (n-type doping). Ultraviolet photoelectron spectroscopy (UPS) further corroborates the interfacial doping model, as MoS2 flakes capped with ultrathin TiO2 exhibit a reduction of 0.3 eV in the effective work function. Finally, a systematic comparison of the impact of selective doping with the TiO2 layer under the source-drain metal relative to that on top of the MoS2 channel shows a larger benefit for transistor performance from the reduction in source-drain contact resistance. PMID:26649572

  11. Microwave field effect transistor

    NASA Technical Reports Server (NTRS)

    Huang, Ho-Chung (Inventor)

    1989-01-01

    Electrodes of a high power, microwave field effect transistor are substantially matched to external input and output networks. The field effect transistor includes a metal ground plane layer, a dielectric layer on the ground plane layer, a gallium arsenide active region on the dielectric layer, and substantially coplanar spaced source, gate, and drain electrodes having active segments covering the active region. The active segment of the gate electrode is located between edges of the active segments of the source and drain electrodes. The gate and drain electrodes include inactive pads remote from the active segments. The pads are connected directly to the input and output networks. The source electrode is connected to the ground plane layer. The space between the electrodes and the geometry of the electrodes extablish parasitic shunt capacitances and series inductances that provide substantial matches between the input network and the gate electrode and between the output network and the drain electrode. Many of the devices are connected in parallel and share a common active region, so that each pair of adjacent devices shares the same source electrodes and each pair of adjacent devices shares the same drain electrodes. The gate electrodes for the parallel devices are formed by a continuous stripe that extends between adjacent devices and is connected at different points to the common gate pad.

  12. Monolithic metal oxide transistors.

    PubMed

    Choi, Yongsuk; Park, Won-Yeong; Kang, Moon Sung; Yi, Gi-Ra; Lee, Jun-Young; Kim, Yong-Hoon; Cho, Jeong Ho

    2015-04-28

    We devised a simple transparent metal oxide thin film transistor architecture composed of only two component materials, an amorphous metal oxide and ion gel gate dielectric, which could be entirely assembled using room-temperature processes on a plastic substrate. The geometry cleverly takes advantage of the unique characteristics of the two components. An oxide layer is metallized upon exposure to plasma, leading to the formation of a monolithic source-channel-drain oxide layer, and the ion gel gate dielectric is used to gate the transistor channel effectively at low voltages through a coplanar gate. We confirmed that the method is generally applicable to a variety of sol-gel-processed amorphous metal oxides, including indium oxide, indium zinc oxide, and indium gallium zinc oxide. An inverter NOT logic device was assembled using the resulting devices as a proof of concept demonstration of the applicability of the devices to logic circuits. The favorable characteristics of these devices, including (i) the simplicity of the device structure with only two components, (ii) the benign fabrication processes at room temperature, (iii) the low-voltage operation under 2 V, and (iv) the excellent and stable electrical performances, together support the application of these devices to low-cost portable gadgets, i.e., cheap electronics. PMID:25777338

  13. Chemoresponsive monolayer transistors

    PubMed Central

    Guo, Xuefeng; Myers, Matthew; Xiao, Shengxiong; Lefenfeld, Michael; Steiner, Rachel; Tulevski, George S.; Tang, Jinyao; Baumert, Julian; Leibfarth, Frank; Yardley, James T.; Steigerwald, Michael L.; Kim, Philip; Nuckolls, Colin

    2006-01-01

    This work details a method to make efficacious field-effect transistors from monolayers of polycyclic aromatic hydrocarbons that are able to sense and respond to their chemical environment. The molecules used in this study are functionalized so that they assemble laterally into columns and attach themselves to the silicon oxide surface of a silicon wafer. To measure the electrical properties of these monolayers, we use ultrasmall point contacts that are separated by only a few nanometers as the source and drain electrodes. These contacts are formed through an oxidative cutting of an individual metallic single-walled carbon nanotube that is held between macroscopic metal leads. The molecules assemble in the gap and form transistors with large current modulation and high gate efficiency. Because these devices are formed from an individual stack of molecules, their electrical properties change significantly when exposed to electron-deficient molecules such as tetracyanoquinodimethane (TCNQ), forming the basis for new types of environmental and molecular sensors. PMID:16855049

  14. Physical limits of silicon transistors and circuits

    NASA Astrophysics Data System (ADS)

    Keyes, Robert W.

    2005-12-01

    A discussion on transistors and electronic computing including some history introduces semiconductor devices and the motivation for miniaturization of transistors. The changing physics of field-effect transistors and ways to mitigate the deterioration in performance caused by the changes follows. The limits of transistors are tied to the requirements of the chips that carry them and the difficulties of fabricating very small structures. Some concluding remarks about transistors and limits are presented.

  15. Graphene as tunable contact for high performance thin film transistor

    NASA Astrophysics Data System (ADS)

    Liu, Yuan

    performance and mechanical robustness. By using the graphene as a work-function tunable contact for amorphous indium gallium zinc oxide (IGZO) thin film, the vertical current flow across the graphene-IGZO junction can be effectively modulated by an external gate potential to enable VTFTs with a highest on-off ratio exceeding 105. The unique vertical transistor architecture can readily enable ultrashort channel devices with very high delivering current and exceptional mechanical flexibility. Furthermore, I will, demonstrate a new design strategy for vertical OTFT with ultra-short channel length without using conventional high-resolution lithography process. They can deliver a high current density over 1.8 A/ cm2 and thus enable a high cutoff frequency devices (~ 0.4 MHz) comparable with the ultra-short channel organic transistors. Importantly, with unique vertical architecture, the entire organic channel material is sandwiched between the source and drain electrodes and is thus naturally protected to ensure excellent air-stability. Finally I will present a new strategy by using graphene as the back electrodes to achieve Ohmic contact to MoS2. With a finite density of states, the Fermi level of graphene can be readily tuned by a gate potential to enable a nearly perfect band alignment with MoS2. For the first time, a transparent contact to MoS2 is demonstrated with zero contact barrier and linear output behaviour at cryogenic temperatures (down to 1.9 K) for both monolayer and multilayer MoS2. Benefiting from the barrier-free transparent contacts, we show that a metal-insulator-transition (MIT) can be observed in a two-terminal MoS2 device, a phenomenon that could be easily masked by Schottky barriers found in conventional metal-contacted MoS2 devices. With further passivation by boron nitride (BN) encapsulation, we demonstrate a record-high extrinsic (two-terminal) field effect mobility up to 1300 cm2/V s in MoS2 at low temperature. These findings can open up exciting new

  16. Graphene as tunable contact for high performance thin film transistor

    NASA Astrophysics Data System (ADS)

    Liu, Yuan

    performance and mechanical robustness. By using the graphene as a work-function tunable contact for amorphous indium gallium zinc oxide (IGZO) thin film, the vertical current flow across the graphene-IGZO junction can be effectively modulated by an external gate potential to enable VTFTs with a highest on-off ratio exceeding 105. The unique vertical transistor architecture can readily enable ultrashort channel devices with very high delivering current and exceptional mechanical flexibility. Furthermore, I will, demonstrate a new design strategy for vertical OTFT with ultra-short channel length without using conventional high-resolution lithography process. They can deliver a high current density over 1.8 A/ cm2 and thus enable a high cutoff frequency devices (~ 0.4 MHz) comparable with the ultra-short channel organic transistors. Importantly, with unique vertical architecture, the entire organic channel material is sandwiched between the source and drain electrodes and is thus naturally protected to ensure excellent air-stability. Finally I will present a new strategy by using graphene as the back electrodes to achieve Ohmic contact to MoS2. With a finite density of states, the Fermi level of graphene can be readily tuned by a gate potential to enable a nearly perfect band alignment with MoS2. For the first time, a transparent contact to MoS2 is demonstrated with zero contact barrier and linear output behaviour at cryogenic temperatures (down to 1.9 K) for both monolayer and multilayer MoS2. Benefiting from the barrier-free transparent contacts, we show that a metal-insulator-transition (MIT) can be observed in a two-terminal MoS2 device, a phenomenon that could be easily masked by Schottky barriers found in conventional metal-contacted MoS2 devices. With further passivation by boron nitride (BN) encapsulation, we demonstrate a record-high extrinsic (two-terminal) field effect mobility up to 1300 cm2/V s in MoS2 at low temperature. These findings can open up exciting new

  17. CFHT MOS/SIS spectrograph performance

    NASA Astrophysics Data System (ADS)

    Le Fevre, O.; Crampton, D.; Felenbok, P.; Monnet, G.

    1994-02-01

    Initial results of laboratory and on-sky tests of the new Canada-France-Hawaii Telescope (CFHT) multi-object spectrograph, metal oxide semiconductor (MOS)/superconducting / insulating / superconducting (SIS), are described. MOS/SIS contains two ways, one of which is primarily intended for imagery and spectroscopy of many tens of objects within a 10 min field, while the other utilizes tip/tilt image stabilization for high spatial resolution imagery and spectroscopy over a 3 min field. Data on image quality, transmission, flexure and stability are presented, as well as a description of the multi-object observing performance. This highly integrated system incorporates yttrium-aluminum garnet (YAG) laser drilling equipment and allows on-line acquisition, aperture mask design and fabrication for multi-slit observations with minimum overhead. A comprehensive software interface provides observers with a user-friendly environment and ensures that all operations can be quickly and efficiently controlled by novice users.

  18. Highly stretchable MoS2 kirigami.

    PubMed

    Hanakata, Paul Z; Qi, Zenan; Campbell, David K; Park, Harold S

    2016-01-01

    We report the results of classical molecular dynamics simulations focused on studying the mechanical properties of MoS2 kirigami. Several different kirigami structures were studied based upon two simple non-dimensional parameters, which are related to the density of cuts, as well as the ratio of the overlapping cut length to the nanoribbon length. Our key findings are significant enhancements in tensile yield (by a factor of four) and fracture strains (by a factor of six) as compared to pristine MoS2 nanoribbons. These results, in conjunction with recent results on graphene, suggest that the kirigami approach may be generally useful for enhancing the ductility of two-dimensional nanomaterials. PMID:26628005

  19. Highly stretchable MoS2 kirigami

    NASA Astrophysics Data System (ADS)

    Hanakata, Paul Z.; Qi, Zenan; Campbell, David K.; Park, Harold S.

    2015-12-01

    We report the results of classical molecular dynamics simulations focused on studying the mechanical properties of MoS2 kirigami. Several different kirigami structures were studied based upon two simple non-dimensional parameters, which are related to the density of cuts, as well as the ratio of the overlapping cut length to the nanoribbon length. Our key findings are significant enhancements in tensile yield (by a factor of four) and fracture strains (by a factor of six) as compared to pristine MoS2 nanoribbons. These results, in conjunction with recent results on graphene, suggest that the kirigami approach may be generally useful for enhancing the ductility of two-dimensional nanomaterials.

  20. Evaluation of a gate-first process for AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors with low ohmic annealing temperature

    NASA Astrophysics Data System (ADS)

    Liuan, Li; Jiaqi, Zhang; Yang, Liu; Jin-Ping, Ao

    2016-03-01

    In this paper, TiN/AlOx gated AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors (MOS-HFETs) were fabricated for gate-first process evaluation. By employing a low temperature ohmic process, ohmic contact can be obtained by annealing at 600 °C with the contact resistance approximately 1.6 Ω·mm. The ohmic annealing process also acts as a post-deposition annealing on the oxide film, resulting in good device performance. Those results demonstrated that the TiN/AlOx gated MOS-HFETs with low temperature ohmic process can be applied for self-aligned gate AlGaN/GaN MOS-HFETs. Project supported by the International Science and Technology Collaboration Program of China (Grant No. 2012DFG52260).

  1. Theoretical analysis of the combined effects of sulfur vacancies and analyte adsorption on the electronic properties of single-layer MoS2.

    PubMed

    Akdim, Brahim; Pachter, Ruth; Mou, Shin

    2016-05-01

    We report a first-principles theoretical investigation on the electronic structure and electron transport of defective single-layer (SL) MoS2, as well as of corresponding structures adsorbed with benzyl viologen (BV), which was shown to provide improved performance of a field effect transistor. O2 adsorption was included to gain an understanding of the response upon air-exposure. Following analysis of the structure and stability of sulfur single vacancy and line defects in SL MoS2, we investigated the local transport at the adsorbed sites via a transport model that mimics a scanning tunneling spectroscopy experiment. Distinct current-voltage characteristics were indicated for adsorbed oxygen species at a sulfur vacancy. The electronic structures of defective MoS2 indicated the emergence of impurity states in the bandgap due to sulfur defects and oxygen adsorption. Electron transport calculations for the MoS2 surface with an extended defect in a device setting demonstrated that physisorption of BV enhances the output current, while facile chemisorption by O2 upon air-exposure causes degradation of electron transport. PMID:26999310

  2. Theoretical analysis of the combined effects of sulfur vacancies and analyte adsorption on the electronic properties of single-layer MoS2

    NASA Astrophysics Data System (ADS)

    Akdim, Brahim; Pachter, Ruth; Mou, Shin

    2016-05-01

    We report a first-principles theoretical investigation on the electronic structure and electron transport of defective single-layer (SL) MoS2, as well as of corresponding structures adsorbed with benzyl viologen (BV), which was shown to provide improved performance of a field effect transistor. O2 adsorption was included to gain an understanding of the response upon air-exposure. Following analysis of the structure and stability of sulfur single vacancy and line defects in SL MoS2, we investigated the local transport at the adsorbed sites via a transport model that mimics a scanning tunneling spectroscopy experiment. Distinct current-voltage characteristics were indicated for adsorbed oxygen species at a sulfur vacancy. The electronic structures of defective MoS2 indicated the emergence of impurity states in the bandgap due to sulfur defects and oxygen adsorption. Electron transport calculations for the MoS2 surface with an extended defect in a device setting demonstrated that physisorption of BV enhances the output current, while facile chemisorption by O2 upon air-exposure causes degradation of electron transport.

  3. MOS and MOSFET with transition metal oxides

    SciTech Connect

    Fu, S.; Egami, T.

    1996-12-31

    MOS and MOSFET structures were constructed with a TiO{sub 2} single crystal as a substrate. It was demonstrated that the n-type carriers injected by the applied gate field have a much higher mobility than the chemically doped carriers, by nearly two orders of magnitude. This result suggests that the intrinsic carrier mobility in TiO{sub 2} may be substantially higher than usually assumed. Other MOSFET effects including the non-linear optical effects are discussed.

  4. Target Capture during Mos1 Transposition*

    PubMed Central

    Pflieger, Aude; Jaillet, Jerôme; Petit, Agnès; Augé-Gouillou, Corinne; Renault, Sylvaine

    2014-01-01

    DNA transposition contributes to genomic plasticity. Target capture is a key step in the transposition process, because it contributes to the selection of new insertion sites. Nothing or little is known about how eukaryotic mariner DNA transposons trigger this step. In the case of Mos1, biochemistry and crystallography have deciphered several inverted terminal repeat-transposase complexes that are intermediates during transposition. However, the target capture complex is still unknown. Here, we show that the preintegration complex (i.e., the excised transposon) is the only complex able to capture a target DNA. Mos1 transposase does not support target commitment, which has been proposed to explain Mos1 random genomic integrations within host genomes. We demonstrate that the TA dinucleotide used as the target is crucial both to target recognition and in the chemistry of the strand transfer reaction. Bent DNA molecules are better targets for the capture when the target DNA is nicked two nucleotides apart from the TA. They improve strand transfer when the target DNA contains a mismatch near the TA dinucleotide. PMID:24269942

  5. WEAVE MOS fibre bundle test plan

    NASA Astrophysics Data System (ADS)

    Sayède, Frédéric; Guinouard, Isabelle; Fasola, Gilles; Lhome, Emilie; Amans, Jean-Philippe; Bonifacio, Piercarlo; Abrams, Don Carlos; Middleton, Kevin; Dalton, Gavin; Aguerri, J. Alfonso L.; Trager, Scott C.; Loeb, Avi

    2014-07-01

    WEAVE is the next-generation wide-field optical spectroscopy facility for the William Herschel Telescope (WHT) in La Palma, Canary Islands, Spain. WEAVE mainly aims at spectroscopic follow-up of ground-based (e.g. LOFAR) and space-based (GAIA) surveys. The facility consists of a new 2-degree field-of-view prime focus corrector with a 1000- multiplex fibre positioner, a small number of individually deployable integral field units, and a large single integral field unit. The IFUs (Integral Field Units) and the MOS fibres can be used to feed a dual-beam spectrograph that will provide full coverage of the majority of the visible spectrum in a single exposure at a spectral resolution of ~5000 or modest wavelength coverage in both arms at a resolution ~20000. The instrument is expected to be on-sky by 2017 to provide spectroscopic sampling of the fainter end of the Gaia astrometric catalogue, chemical labeling of stars to V~17, and dedicated follow up of substantial numbers of sources from the medium deep LOFAR surveys. After a brief description of the MOS fibre bundle, we described the proposed test plan and the test bench of the 2x1000 WEAVE MOS fibres. The test bench allows us to evaluate the Focal Ratio Degradation and the throughput of the fibers fitted with their buttons and slitlets.

  6. Exciton and Trion Dynamics in Bilayer MoS2.

    PubMed

    Pei, Jiajie; Yang, Jiong; Xu, Renjing; Zeng, Yong-Hui; Myint, Ye Win; Zhang, Shuang; Zheng, Jin-Cheng; Qin, Qinghua; Wang, Xibin; Jiang, Wugui; Lu, Yuerui

    2015-12-22

    The control of exciton and triondynamics in bilayer MoS2 is demonstrated, via the comodulations by both temperature and electric field. The calculations here show that the band structure of bilayer MoS2 changes from indirect at room temperature toward direct nature as temperature decreases, which enables the electrical tunability of the K-K direct PL transition in bilayer MoS2 at low temperature. PMID:26542884

  7. Rolling Up a Monolayer MoS2 Sheet.

    PubMed

    Meng, Jianling; Wang, Guole; Li, Xiaomin; Lu, Xiaobo; Zhang, Jing; Yu, Hua; Chen, Wei; Du, Luojun; Liao, Mengzhou; Zhao, Jing; Chen, Peng; Zhu, Jianqi; Bai, Xuedong; Shi, Dongxia; Zhang, Guangyu

    2016-07-01

    MoS2 nanoscrolls are formed by argon plasma treatment on monolayer MoS2 sheet. The nanoscale scroll formation is attributed to the partial removal of top sulfur layer in MoS2 during the argon plasma treatment process. This convenient, solvent-free, and high-yielding nanoscroll formation technique is also feasible for other 2D transition metal dichalcogenides. PMID:27322776

  8. Transistorized converter provides nondissipative regulation

    NASA Technical Reports Server (NTRS)

    1964-01-01

    A transistorized regulator converter efficiently converts fluctuating input voltages to a constant output voltage, avoiding the use of saturable reactors. It is nondissipative in operation and functions in an open loop through variable duty cycles.

  9. High transconductance organic electrochemical transistors

    PubMed Central

    Khodagholy, Dion; Rivnay, Jonathan; Sessolo, Michele; Gurfinkel, Moshe; Leleux, Pierre; Jimison, Leslie H.; Stavrinidou, Eleni; Herve, Thierry; Sanaur, Sébastien; Owens, Róisín M.; Malliaras, George G.

    2013-01-01

    The development of transistors with high gain is essential for applications ranging from switching elements and drivers to transducers for chemical and biological sensing. Organic transistors have become well-established based on their distinct advantages, including ease of fabrication, synthetic freedom for chemical functionalization, and the ability to take on unique form factors. These devices, however, are largely viewed as belonging to the low-end of the performance spectrum. Here we present organic electrochemical transistors with a transconductance in the mS range, outperforming transistors from both traditional and emerging semiconductors. The transconductance of these devices remains fairly constant from DC up to a frequency of the order of 1 kHz, a value determined by the process of ion transport between the electrolyte and the channel. These devices, which continue to work even after being crumpled, are predicted to be highly relevant as transducers in biosensing applications. PMID:23851620

  10. Solder Bonding for Power Transistors

    NASA Technical Reports Server (NTRS)

    Snytsheuvel, H. A.; Mandel, H.

    1985-01-01

    Indium solder boosts power rating and facilitates circuit changes. Efficient heat conduction from power transistor to heat sink provided by layer of indium solder. Low melting point of indium solder (141 degrees C) allows power transistor to be removed, if circuit must be reworked, without disturbing other components mounted with ordinary solder that melts at 181 degrees C. Solder allows devices operated at higher power levels than does conventional attachment by screws.

  11. Magnetoresistance in Co/2D MoS2/Co and Ni/2D MoS2/Ni junctions.

    PubMed

    Zhang, Han; Ye, Meng; Wang, Yangyang; Quhe, Ruge; Pan, Yuanyuan; Guo, Ying; Song, Zhigang; Yang, Jinbo; Guo, Wanlin; Lu, Jing

    2016-06-28

    Semiconducting single-layer (SL) and few-layer MoS2 have a flat surface, free of dangling bonds. Using density functional theory coupled with non-equilibrium Green's function method, we investigate the spin-polarized transport properties of Co/2D MoS2/Co and Ni/2D MoS2/Ni junctions with MoS2 layer numbers of N = 1, 3, and 5. Well-defined interfaces are formed between MoS2 and metal electrodes. The junctions with a SL MoS2 spacer are almost metallic owing to the strong coupling between MoS2 and the ferromagnets, while those are tunneling with a few layer MoS2 spacer. Both large magnetoresistance and tunneling magnetoresistance are found when fcc or hcp Co is used as an electrode. Therefore, flat single- and few-layer MoS2 can serve as an effective nonmagnetic spacer in a magnetoresistance or tunneling magnetoresistance device with a well-defined interface. PMID:27257639

  12. A method for polycrystalline silicon delineation applicable to a double-diffused MOS transistor

    NASA Technical Reports Server (NTRS)

    Halsor, J. L.; Lin, H. C.

    1974-01-01

    Method is simple and eliminates requirement for unreliable special etchants. Structure is graded in resistivity to prevent punch-through and has very narrow channel length to increase frequency response. Contacts are on top to permit planar integrated circuit structure. Polycrystalline shield will prevent creation of inversion layer in isolated region.

  13. Vertically stacked multi-heterostructures of layered materials for logic transistors and complementary inverters

    PubMed Central

    Yu, Woo Jong; Li, Zheng; Zhou, Hailong; Chen, Yu; Wang, Yang; Huang, Yu; Duan, Xiangfeng

    2014-01-01

    The layered materials such as graphene have attracted considerable interest for future electronics. Here we report the vertical integration of multi-heterostructures of layered materials to enable high current density vertical field-effect transistors (VFETs). An n-channel VFET is created by sandwiching few-layer molybdenum disulfide (MoS2) as the semiconducting channel between a monolayer graphene and a metal thin film. The VFETs exhibit a room temperature on-off ratio >103, while at same time deliver a high current density up to 5,000 A/cm2, sufficient for high performance logic applications. This study offers a general strategy for the vertical integration of various layered materials to obtain both p- and n-channel transistors for complementary logic functions. A complementary inverter with larger than unit voltage gain is demonstrated by vertically stacking the layered materials of graphene, Bi2Sr2Co2O8 (p-channel), graphene, MoS2 (n-channel), and metal thin film in sequence. The ability to simultaneously achieve high on-off ratio, high current density, and logic integration in the vertically stacked multi-heterostructures can open up a new dimension for future electronics to enable three-dimensional integration. PMID:23241535

  14. A high-performance complementary inverter based on transition metal dichalcogenide field-effect transistors.

    PubMed

    Cho, Ah-Jin; Park, Kee Chan; Kwon, Jang-Yeon

    2015-01-01

    For several years, graphene has been the focus of much attention due to its peculiar characteristics, and it is now considered to be a representative 2-dimensional (2D) material. Even though many research groups have studied on the graphene, its intrinsic nature of a zero band-gap, limits its use in practical applications, particularly in logic circuits. Recently, transition metal dichalcogenides (TMDs), which are another type of 2D material, have drawn attention due to the advantage of having a sizable band-gap and a high mobility. Here, we report on the design of a complementary inverter, one of the most basic logic elements, which is based on a MoS2 n-type transistor and a WSe2 p-type transistor. The advantages provided by the complementary metal-oxide-semiconductor (CMOS) configuration and the high-performance TMD channels allow us to fabricate a TMD complementary inverter that has a high-gain of 13.7. This work demonstrates the operation of the MoS2 n-FET and WSe2 p-FET on the same substrate, and the electrical performance of the CMOS inverter, which is based on a different driving current, is also measured. PMID:25852410

  15. A high-performance complementary inverter based on transition metal dichalcogenide field-effect transistors

    NASA Astrophysics Data System (ADS)

    Cho, Ah-Jin; Park, Kee Chan; Kwon, Jang-Yeon

    2015-03-01

    For several years, graphene has been the focus of much attention due to its peculiar characteristics, and it is now considered to be a representative 2-dimensional (2D) material. Even though many research groups have studied on the graphene, its intrinsic nature of a zero band-gap, limits its use in practical applications, particularly in logic circuits. Recently, transition metal dichalcogenides (TMDs), which are another type of 2D material, have drawn attention due to the advantage of having a sizable band-gap and a high mobility. Here, we report on the design of a complementary inverter, one of the most basic logic elements, which is based on a MoS2 n-type transistor and a WSe2 p-type transistor. The advantages provided by the complementary metal-oxide-semiconductor (CMOS) configuration and the high-performance TMD channels allow us to fabricate a TMD complementary inverter that has a high-gain of 13.7. This work demonstrates the operation of the MoS2 n-FET and WSe2 p-FET on the same substrate, and the electrical performance of the CMOS inverter, which is based on a different driving current, is also measured.

  16. Evolvable circuit with transistor-level reconfigurability

    NASA Technical Reports Server (NTRS)

    Stoica, Adrian (Inventor); Salazar-Lazaro, Carlos Harold (Inventor)

    2004-01-01

    An evolvable circuit includes a plurality of reconfigurable switches, a plurality of transistors within a region of the circuit, the plurality of transistors having terminals, the plurality of transistors being coupled between a power source terminal and a power sink terminal so as to be capable of admitting power between the power source terminal and the power sink terminal, the plurality of transistors being coupled so that every transistor terminal to transistor terminal coupling within the region of the circuit comprises a reconfigurable switch.

  17. Facile Routes To Improve Performance of Solution-Processed Amorphous Metal Oxide Thin Film Transistors by Water Vapor Annealing.

    PubMed

    Park, Won-Tae; Son, Inyoung; Park, Hyun-Woo; Chung, Kwun-Bum; Xu, Yong; Lee, Taegweon; Noh, Yong-Young

    2015-06-24

    Here, we report on a simple and high-rate oxidization method for producing solution-based compound mixtures of indium zinc oxide (IZO) and indium gallium zinc oxide (IGZO) metal-oxide semiconductors (MOS) for thin-film transistor (TFT) applications. One of the issues for solution-based MOS fabrication is how to sufficiently oxidize the precursor in order to achieve high performance. As the oxidation rate of solution processing is lower than vacuum-based deposition such as sputtering, devices using solution-processed MOS exhibit relatively poorer performance. Therefore, we propose a method to prepare the metal-oxide precursor upon exposure to saturated water vapor in a closed volume for increasing the oxidization efficiency without requiring additional oxidizing agent. We found that the hydroxide rate of the MOS film exposed to water vapor is lower than when unexposed (≤18%). Hence, we successfully fabricated oxide TFTs with high electron mobility (27.9 cm(2)/V·s) and established a rapid process (annealing at 400 °C for 5 min) that is much shorter than the conventional as-deposited long-duration annealing (at 400 °C for 1 h) whose corresponding mobility is even lower (19.2 cm(2)/V·s). PMID:26043206

  18. Impact of field-induced quantum confinement on the onset of tunneling field-effect transistors: Experimental verification

    SciTech Connect

    Smets, Quentin Verreck, Devin; Heyns, Marc M.; Verhulst, Anne S.; Martens, Koen; Lin, Han Chung; Kazzi, Salim El; Simoen, Eddy; Collaert, Nadine; Thean, Aaron; Raskin, Jean-Pierre

    2014-11-17

    The Tunneling Field-Effect Transistor (TFET) is a promising device for future low-power logic. Its performance is often predicted using semiclassical simulations, but there is usually a large discrepancy with experimental results. An important reason is that Field-Induced Quantum Confinement (FIQC) is neglected. Quantum mechanical simulations show FIQC delays the onset of Band-To-Band Tunneling (BTBT) with hundreds of millivolts in the promising line-TFET configuration. In this letter, we provide experimental verification of this delayed onset. We accomplish this by developing a method where line-TFET are modeled using highly doped MOS capacitors (MOS-CAP). Using capacitance-voltage measurements, we demonstrate AC inversion by BTBT, which was so far unobserved in MOS-CAP. Good agreement is shown between the experimentally obtained BTBT onset and quantum mechanical predictions, proving the need to include FIQC in all TFET simulations. Finally, we show that highly doped MOS-CAP is promising for characterization of traps deep into the conduction band.

  19. Ammonia gas sensors based on poly (3-hexylthiophene)-molybdenum disulfide film transistors

    NASA Astrophysics Data System (ADS)

    Xie, Tao; Xie, Guangzhong; Su, Yuanjie; Hongfei, Du; Ye, Zongbiao; Jiang, Yadong

    2016-02-01

    In this work, in order to enhance the recovery performance of organic thin film transistors (OTFTs) ammonia (NH3) sensors, poly (3-hexylthiophene) (P3HT) and molybdenum disulfide (MoS2) were combined as sensitive materials. Different sensitive film structures as active layers of OTFTs, i.e., P3HT-MoS2 composite film, P3HT/MoS2 bilayer film and MoS2/P3HT bilayer film were fabricated by spray technology. OTFT gas sensors based on P3HT-MoS2 composite film showed a shorter recovery time than others when the ammonia concentration changed from 4 to 20 ppm. Specifically, x-ray diffraction (XRD), Raman and UV-visible absorption were employed to explore the interface properties between P3HT and single-layer MoS2. Through the complementary characterization, a mechanism based on charge transfer is proposed to explain the physical originality of these OTFT gas sensors: closer interlayer d-spacing and better π-π stacking of the P3HT chains in composite film have ensured a short recovery time of OTFT gas sensors. Moreover, sensing mechanisms of OTFTs were further studied by comparing the device performance in the presence of nitrogen or dry air as a carrier gas. This work not only strengthens the fundamental understanding of the sensing mechanism, but provides a promising approach to optimizing the OTFT gas sensors.

  20. Torsional Deformations in Subnanometer MoS Interconnecting Wires.

    PubMed

    Koh, Ai Leen; Wang, Shanshan; Ataca, Can; Grossman, Jeffrey C; Sinclair, Robert; Warner, Jamie H

    2016-02-10

    We use aberration-corrected transmission electron microscopy to track the real time atomic level torsional dynamics of subnanometer wires of MoS interconnecting monolayer regions of MoS2. An in situ heating holder is used inside the transmission electron microscope to raise the temperature of the sample to 400 °C to increase crystallization rates of the wires and reduce contamination effects. Frequent rotational twisting of the MoS wire is captured, demonstrating elastic torsional deformation of the MoS wires. We show that torsional rotations of the crystal structure of the MoS wires depend upon the specific atomic structure of the anchored sections of the suspended wire and the number of unit cells that make up the wire length. Elastic torsional flexibility of the MoS wires is revealed to help their self-adapting connectivity during the structural changes. Plastic torsional deformation is also seen for MoS wires that contain defects in their crystal structure, which produce small scale rotational disorder within the wires. Upon removal of the defects, the wire returns back to pristine form. These results provide detailed insights into how the atomic structure of the anchoring site significantly influences the nanowire configurations relative to the monolayered MoS2. PMID:26785319

  1. MOS: The Critical Elements of Doing Effective Classroom Demonstrations

    ERIC Educational Resources Information Center

    Shmaefsky, Brian R.

    2005-01-01

    MOS, or Minds-On-Science, is the foundation of conducting educationally valuable science demonstrations. It is a teaching strategy equally effective as hands-on-learning. Plus, it proves much more effective at reinforcing abstract science concepts than traditional lectures, readings, and audiovisual presentations. Adding MOS to a demonstration…

  2. Seeing diabetes: visual detection of glucose based on the intrinsic peroxidase-like activity of MoS2 nanosheets

    NASA Astrophysics Data System (ADS)

    Lin, Tianran; Zhong, Liangshuang; Guo, Liangqia; Fu, Fengfu; Chen, Guonan

    2014-09-01

    Molybdenum disulfide (MoS2) has attracted increasing research interest recently due to its unique physical, optical and electrical properties, correlated with its 2D ultrathin atomic-layered structure. Until now, however, great efforts have focused on its applications such as lithium ion batteries, transistors, and hydrogen evolution reactions. Herein, for the first time, MoS2 nanosheets are discovered to possess an intrinsic peroxidase-like activity and can catalytically oxidize 3,3',5,5'-tetramethylbenzidine (TMB) by H2O2 to produce a color reaction. The catalytic activity follows the typical Michaelis-Menten kinetics and is dependent on temperature, pH, H2O2 concentration, and reaction time. Based on this finding, a highly sensitive and selective colorimetric method for H2O2 and glucose detection is developed and applied to detect glucose in serum samples. Moreover, a simple, inexpensive, instrument-free and portable test kit for the visual detection of glucose in normal and diabetic serum samples is constructed by utilizing agarose hydrogel as a visual detection platform.Molybdenum disulfide (MoS2) has attracted increasing research interest recently due to its unique physical, optical and electrical properties, correlated with its 2D ultrathin atomic-layered structure. Until now, however, great efforts have focused on its applications such as lithium ion batteries, transistors, and hydrogen evolution reactions. Herein, for the first time, MoS2 nanosheets are discovered to possess an intrinsic peroxidase-like activity and can catalytically oxidize 3,3',5,5'-tetramethylbenzidine (TMB) by H2O2 to produce a color reaction. The catalytic activity follows the typical Michaelis-Menten kinetics and is dependent on temperature, pH, H2O2 concentration, and reaction time. Based on this finding, a highly sensitive and selective colorimetric method for H2O2 and glucose detection is developed and applied to detect glucose in serum samples. Moreover, a simple, inexpensive

  3. Toward Ferroelectric Control of Monolayer MoS2.

    PubMed

    Nguyen, Ariana; Sharma, Pankaj; Scott, Thomas; Preciado, Edwin; Klee, Velveth; Sun, Dezheng; Lu, I-Hsi Daniel; Barroso, David; Kim, SukHyun; Shur, Vladimir Ya; Akhmatkhanov, Andrey R; Gruverman, Alexei; Bartels, Ludwig; Dowben, Peter A

    2015-05-13

    The chemical vapor deposition (CVD) of molybdenum disulfide (MoS2) single-layer films onto periodically poled lithium niobate is possible while maintaining the substrate polarization pattern. The MoS2 growth exhibits a preference for the ferroelectric domains polarized "up" with respect to the surface so that the MoS2 film may be templated by the substrate ferroelectric polarization pattern without the need for further lithography. MoS2 monolayers preserve the surface polarization of the "up" domains, while slightly quenching the surface polarization on the "down" domains as revealed by piezoresponse force microscopy. Electrical transport measurements suggest changes in the dominant carrier for CVD MoS2 under application of an external voltage, depending on the domain orientation of the ferroelectric substrate. Such sensitivity to ferroelectric substrate polarization opens the possibility for ferroelectric nonvolatile gating of transition metal dichalcogenides in scalable devices fabricated free of exfoliation and transfer. PMID:25909996

  4. Gate-defined Single Electron Transistor in a Graphene-MoS2 van der Waals Heterostructure

    NASA Astrophysics Data System (ADS)

    Wang, Ke; Taniguchi, Takashi; Watanabe, Kenji; Kim, Philip

    We report experimental demonstration of fabrication of laterally confined single electron transistor (SET) on MoS2 transition metal dichalcogenide (TMDC) semiconductor. A few atomic layers of MoS2 single crystals are encapsulated in hBN layers in order to improve mobility of 2-dimensional (2D) electron channel. Graphene layers are employed to provide Ohmic contact to the TMDC channels. The laterally confined quantum dots are formed by electrostatically depleting the near-by 2D channel employing local gate fabricated by electron lithography. Typical SET transport signatures such as gate-tunable Coulomb blockade have been observed. We have demonstrated the quantum confinement can be sensitively tuned to adjust the dot-reservoir coupling. The work paves way for more complicated device structure such as valley-spin filter and vertically coupled quantum dots in Coulomb drag devices.

  5. Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors

    NASA Astrophysics Data System (ADS)

    Shih, Huan-Yu; Chu, Fu-Chuan; Das, Atanu; Lee, Chia-Yu; Chen, Ming-Jang; Lin, Ray-Ming

    2016-04-01

    In this study, films of gallium oxide (Ga2O3) were prepared through remote plasma atomic layer deposition (RP-ALD) using triethylgallium and oxygen plasma. The chemical composition and optical properties of the Ga2O3 thin films were investigated; the saturation growth displayed a linear dependence with respect to the number of ALD cycles. These uniform ALD films exhibited excellent uniformity and smooth Ga2O3-GaN interfaces. An ALD Ga2O3 film was then used as the gate dielectric and surface passivation layer in a metal-oxide-semiconductor high-electron-mobility transistor (MOS-HEMT), which exhibited device performance superior to that of a corresponding conventional Schottky gate HEMT. Under similar bias conditions, the gate leakage currents of the MOS-HEMT were two orders of magnitude lower than those of the conventional HEMT, with the power-added efficiency enhanced by up to 9 %. The subthreshold swing and effective interfacial state density of the MOS-HEMT were 78 mV decade-1 and 3.62 × 1011 eV-1 cm-2, respectively. The direct-current and radio-frequency performances of the MOS-HEMT device were greater than those of the conventional HEMT. In addition, the flicker noise of the MOS-HEMT was lower than that of the conventional HEMT.

  6. Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors.

    PubMed

    Shih, Huan-Yu; Chu, Fu-Chuan; Das, Atanu; Lee, Chia-Yu; Chen, Ming-Jang; Lin, Ray-Ming

    2016-12-01

    In this study, films of gallium oxide (Ga2O3) were prepared through remote plasma atomic layer deposition (RP-ALD) using triethylgallium and oxygen plasma. The chemical composition and optical properties of the Ga2O3 thin films were investigated; the saturation growth displayed a linear dependence with respect to the number of ALD cycles. These uniform ALD films exhibited excellent uniformity and smooth Ga2O3-GaN interfaces. An ALD Ga2O3 film was then used as the gate dielectric and surface passivation layer in a metal-oxide-semiconductor high-electron-mobility transistor (MOS-HEMT), which exhibited device performance superior to that of a corresponding conventional Schottky gate HEMT. Under similar bias conditions, the gate leakage currents of the MOS-HEMT were two orders of magnitude lower than those of the conventional HEMT, with the power-added efficiency enhanced by up to 9 %. The subthreshold swing and effective interfacial state density of the MOS-HEMT were 78 mV decade(-1) and 3.62 × 10(11) eV(-1) cm(-2), respectively. The direct-current and radio-frequency performances of the MOS-HEMT device were greater than those of the conventional HEMT. In addition, the flicker noise of the MOS-HEMT was lower than that of the conventional HEMT. PMID:27129687

  7. Single-Electron Transistors

    NASA Astrophysics Data System (ADS)

    Fulton, T. A.

    2000-03-01

    Subsequent to the early work, the basic all-metal single-electron transistor (SET) and its semiconductor counterparts have become widely studied, both for their own behavior and for applications. For many people, the SET is an everyday research tool whose inner workings, even though they depend on charge quantization and the energy-time uncertainty principle, can readily be understood (given electron tunneling) by simple arguments based on elementary circuit models. Our own further studies, in various collaborations, were first concerned with finding and studying interactions between charging effects and Josephson tunneling in SET circuits, which had been the original motivation. Later, looking into applications for SETs, we demonstrated a crude but recognizable form of single-electron memory. Significant digital-circuit applications of SETs still seem remote, alas, but some analog applications are promising. Recently, in an ongoing collaboration, we have fabricated an SET on the tip of a tapered glass fiber for use as a scanning probe. With it, we have mapped the electric fields over a two-dimensional electron gas having a density, n, that varies with position. In the quantum Hall regime, step-like changes in surface potential are seen along lines where n corresponds to an integer filling factor ("edge-state regions"). Currently, we are investigating certain sub-micrometer structures, which sometimes form small networks, that appear in these regions. This structure seems to involve localization of individual electrons. note

  8. Passivated ambipolar black phosphorus transistors

    NASA Astrophysics Data System (ADS)

    Yue, Dewu; Lee, Daeyeong; Jang, Young Dae; Choi, Min Sup; Nam, Hye Jin; Jung, Duk-Young; Yoo, Won Jong

    2016-06-01

    We report the first air-passivated ambipolar BP transistor formed by applying benzyl viologen, which serves as a surface charge transfer donor for BP flakes. The passivated BP devices exhibit excellent stability under both an ambient atmosphere and vacuum; their transistor performance is maintained semi-permanently. Unlike their intrinsic p-type properties, passivated BP devices present advantageous ambipolar properties with much higher electron mobility up to ~83 cm2 V-1 s-1 from 2-terminal measurement at 300 K, compared to other reported studies on n-type BP transistors. On the basis of the n-type doping effect that originated from benzyl viologen, we also systematically investigated the BP thickness dependence of our devices on electrical properties, in which we found the best electron transport performance to be attained when an ~10 nm thick BP flake was used.We report the first air-passivated ambipolar BP transistor formed by applying benzyl viologen, which serves as a surface charge transfer donor for BP flakes. The passivated BP devices exhibit excellent stability under both an ambient atmosphere and vacuum; their transistor performance is maintained semi-permanently. Unlike their intrinsic p-type properties, passivated BP devices present advantageous ambipolar properties with much higher electron mobility up to ~83 cm2 V-1 s-1 from 2-terminal measurement at 300 K, compared to other reported studies on n-type BP transistors. On the basis of the n-type doping effect that originated from benzyl viologen, we also systematically investigated the BP thickness dependence of our devices on electrical properties, in which we found the best electron transport performance to be attained when an ~10 nm thick BP flake was used. Electronic supplementary information (ESI) available: Transfer characteristics of BP field effect transistors (BV1-BV4) (Fig. S1 and S2 and Table S1); output characteristics of BP field effect transistors in different directions (Fig. S3

  9. Chemistry of MOS-LSI radiation hardening

    NASA Technical Reports Server (NTRS)

    Grunthaner, P.

    1985-01-01

    The objective of this task was to obtain chemical information on MOS test samples. Toward this end, high resolution X-ray photoemission spectroscopy (XPS) has been the primary techniques used to characterize the chemistry and structure of the SiO2/Si interface for a variety of MOS structures with differing degrees of susceptibility to damage by ionizing radiation. The major accomplishments of this program are: (1) the identification of a structurally distinct region of SiO2 in the near-interfacial region of thermal SiO2 on Si; (2) the identification in the near-interfacial region of SiO2 structural differences between radiation hard and soft gate oxides; (3) the direct observation of radiation-induced damage sites in thermal SiO2 with XPS using in situ electron stress; (4) the correlation of suboxide state distributions at the SiO2/Si interface with processing parameters and radiation susceptibility; (5) the development of a chemical mechanism for radiation-induced interface state generation in SiO2/Si structures; and (6) the development benign chemical profiling techniques which permit the investigation of oxide/semiconductor structures using surface sensitive electron spectroscopic techniques.

  10. RKKY interaction in MoS2

    NASA Astrophysics Data System (ADS)

    Mastrogiuseppe, Diego; Sandler, Nancy; Ulloa, Sergio

    2014-03-01

    MoS2 belongs to a family of layered compounds -the transition metal dichalcogenides- that are attracting increasing attention in the solid state community due to their very rich phase diagram. In particular, the semiconducting ones in their 2D form, are of particular interest in the search for a new generation of devices in nanoelectronics and nanophotonics. The hexagonal lattice allows one to describe the low-energy physics with a massive Dirac equation around the K and K' points. Moreover, the presence of a large intrinsic spin-orbit interaction due to the presence of transition metal atoms, leads to a valley-dependent splitting of the states of an otherwise spin-degenerate valence spectrum. We study the Ruderman-Kittel-Kasuya-Yosida (RKKY) interaction between two magnetic impurities in the direct band gap semiconducting single-layer MoS2, focusing in the p-doped case. Going beyond a recent study, we include the effects of the spin-degenerate valence bands at the center of the Brillouin zone, relevant for energies close to the valence band maximum. The easy experimental tunability of the carrier concentration by electrical or chemical means, makes possible the study of the carrier-mediated spin-spin interaction at different fillings. Supported by NSF-MWN/CIAM and NSF-PIRE.

  11. Passivated ambipolar black phosphorus transistors.

    PubMed

    Yue, Dewu; Lee, Daeyeong; Jang, Young Dae; Choi, Min Sup; Nam, Hye Jin; Jung, Duk-Young; Yoo, Won Jong

    2016-07-01

    We report the first air-passivated ambipolar BP transistor formed by applying benzyl viologen, which serves as a surface charge transfer donor for BP flakes. The passivated BP devices exhibit excellent stability under both an ambient atmosphere and vacuum; their transistor performance is maintained semi-permanently. Unlike their intrinsic p-type properties, passivated BP devices present advantageous ambipolar properties with much higher electron mobility up to ∼83 cm(2) V(-1) s(-1) from 2-terminal measurement at 300 K, compared to other reported studies on n-type BP transistors. On the basis of the n-type doping effect that originated from benzyl viologen, we also systematically investigated the BP thickness dependence of our devices on electrical properties, in which we found the best electron transport performance to be attained when an ∼10 nm thick BP flake was used. PMID:27283027

  12. Magnetic Vortex Based Transistor Operations

    PubMed Central

    Kumar, D.; Barman, S.; Barman, A.

    2014-01-01

    Transistors constitute the backbone of modern day electronics. Since their advent, researchers have been seeking ways to make smaller and more efficient transistors. Here, we demonstrate a sustained amplification of magnetic vortex core gyration in coupled two and three vortices by controlling their relative core polarities. This amplification is mediated by a cascade of antivortex solitons travelling through the dynamic stray field. We further demonstrated that the amplification can be controlled by switching the polarity of the middle vortex in a three vortex sequence and the gain can be controlled by the input signal amplitude. An attempt to show fan–out operation yielded gain for one of the symmetrically placed branches which can be reversed by switching the core polarity of all the vortices in the network. The above observations promote the magnetic vortices as suitable candidates to work as stable bipolar junction transistors (BJT). PMID:24531235

  13. High current gain transistor laser.

    PubMed

    Liang, Song; Qiao, Lijun; Zhu, Hongliang; Wang, Wei

    2016-01-01

    A transistor laser (TL), having the structure of a transistor with multi-quantum wells near its base region, bridges the functionality gap between lasers and transistors. However, light emission is produced at the expense of current gain for all the TLs reported up to now, leading to a very low current gain. We propose a novel design of TLs, which have an n-doped InP layer inserted in the emitter ridge. Numerical studies show that a current flow aperture for only holes can be formed in the center of the emitter ridge. As a result, the common emitter current gain can be as large as 143.3, which is over 15 times larger than that of a TL without the aperture. Besides, the effects of nonradiative recombination defects can be reduced greatly because the flow of holes is confined in the center region of the emitter ridge. PMID:27282466

  14. High current gain transistor laser

    NASA Astrophysics Data System (ADS)

    Liang, Song; Qiao, Lijun; Zhu, Hongliang; Wang, Wei

    2016-06-01

    A transistor laser (TL), having the structure of a transistor with multi-quantum wells near its base region, bridges the functionality gap between lasers and transistors. However, light emission is produced at the expense of current gain for all the TLs reported up to now, leading to a very low current gain. We propose a novel design of TLs, which have an n-doped InP layer inserted in the emitter ridge. Numerical studies show that a current flow aperture for only holes can be formed in the center of the emitter ridge. As a result, the common emitter current gain can be as large as 143.3, which is over 15 times larger than that of a TL without the aperture. Besides, the effects of nonradiative recombination defects can be reduced greatly because the flow of holes is confined in the center region of the emitter ridge.

  15. High current gain transistor laser

    PubMed Central

    Liang, Song; Qiao, Lijun; Zhu, Hongliang; Wang, Wei

    2016-01-01

    A transistor laser (TL), having the structure of a transistor with multi-quantum wells near its base region, bridges the functionality gap between lasers and transistors. However, light emission is produced at the expense of current gain for all the TLs reported up to now, leading to a very low current gain. We propose a novel design of TLs, which have an n-doped InP layer inserted in the emitter ridge. Numerical studies show that a current flow aperture for only holes can be formed in the center of the emitter ridge. As a result, the common emitter current gain can be as large as 143.3, which is over 15 times larger than that of a TL without the aperture. Besides, the effects of nonradiative recombination defects can be reduced greatly because the flow of holes is confined in the center region of the emitter ridge. PMID:27282466

  16. Synthesis and characterization of MoS2 nanosheets.

    PubMed

    Deokar, G; Vignaud, D; Arenal, R; Louette, P; Colomer, J-F

    2016-02-19

    Here, we report on the synthesis of MoS2 nanosheets using a simple two-step additive-free growth technique. The as-synthesized nanosheets were characterized to determine their structure and composition, as well as their optical properties. The MoS2 nanosheets were analyzed by scanning electron microscopy, transmission electron microscopy (TEM), including high-resolution scanning TEM imaging and energy-dispersive x-ray spectroscopy, x-ray photoelectron spectroscopy (XPS), Raman spectroscopy and photoluminescence (PL). The as-produced MoS2 nanosheets are vertically aligned with curved edges and are densely populated. The TEM measurements confirmed that the nanosheets have the 2H-MoS2 crystal structure in agreement with the Raman results. The XPS results revealed the presence of high purity MoS2. Moreover, a prominent PL similar to mechanically exfoliated few and mono-layer MoS2 was observed for the as-grown nanosheets. For the thin (≤50 nm) nanosheets, the PL feature was observed at the same energy as that for a direct band-gap monolayer MoS2 (1.83 eV). Thus, the as-produced high-quality, large-area, MoS2 nanosheets could be potentially useful for various optoelectronic and catalysis applications. PMID:26789493

  17. Synthesis and characterization of MoS2 nanosheets

    NASA Astrophysics Data System (ADS)

    Deokar, G.; Vignaud, D.; Arenal, R.; Louette, P.; Colomer, J.-F.

    2016-02-01

    Here, we report on the synthesis of MoS2 nanosheets using a simple two-step additive-free growth technique. The as-synthesized nanosheets were characterized to determine their structure and composition, as well as their optical properties. The MoS2 nanosheets were analyzed by scanning electron microscopy, transmission electron microscopy (TEM), including high-resolution scanning TEM imaging and energy-dispersive x-ray spectroscopy, x-ray photoelectron spectroscopy (XPS), Raman spectroscopy and photoluminescence (PL). The as-produced MoS2 nanosheets are vertically aligned with curved edges and are densely populated. The TEM measurements confirmed that the nanosheets have the 2H-MoS2 crystal structure in agreement with the Raman results. The XPS results revealed the presence of high purity MoS2. Moreover, a prominent PL similar to mechanically exfoliated few and mono-layer MoS2 was observed for the as-grown nanosheets. For the thin (≤50 nm) nanosheets, the PL feature was observed at the same energy as that for a direct band-gap monolayer MoS2 (1.83 eV). Thus, the as-produced high-quality, large-area, MoS2 nanosheets could be potentially useful for various optoelectronic and catalysis applications.

  18. Imaging spectroscopic ellipsometry of MoS2

    NASA Astrophysics Data System (ADS)

    Funke, S.; Miller, B.; Parzinger, E.; Thiesen, P.; Holleitner, A. W.; Wurstbauer, U.

    2016-09-01

    Micromechanically exfoliated mono- and multilayers of molybdenum disulfide (MoS2) are investigated by spectroscopic imaging ellipsometry. In combination with knife edge illumination, MoS2 flakes can be detected and classified on arbitrary flat and also transparent substrates with a lateral resolution down to 1–2 µm. The complex dielectric functions from mono- and trilayer MoS2 are presented. They are extracted from a multilayer model to fit the measured ellipsometric angles employing an anisotropic and an isotropic fit approach. We find that the energies of the critical points of the optical constants can be treated to be independent of the utilized model, whereas the magnitude of the optical constants varies with the used model. The anisotropic model suggests a maximum absorbance for a MoS2 sheet supported by sapphire of about 14% for monolayer and of 10% for trilayer MoS2. Furthermore, the lateral homogeneity of the complex dielectric function for monolayer MoS2 is investigated with a spatial resolution of 2 µm. Only minor fluctuations are observed. No evidence for strain, for a significant amount of disorder or lattice defects can be found in the wrinkle-free regions of the MoS2 monolayer from complementary µ-Raman spectroscopy measurements. We assume that the minor lateral variation in the optical constants are caused by lateral modification in the van der Waals interaction presumably caused by the preparation using micromechanical exfoliation and viscoelastic stamping.

  19. Phonon bandgap engineering of strained monolayer MoS2

    NASA Astrophysics Data System (ADS)

    Jiang, Jin-Wu

    2014-06-01

    The phonon band structure of monolayer MoS2 is characteristic of a large energy gap between acoustic and optical branches, which protects the vibration of acoustic modes from being scattered by optical phonon modes. Therefore, the phonon bandgap engineering is of practical significance for the manipulation of phonon-related mechanical or thermal properties in monolayer MoS2. We perform both phonon analysis and molecular dynamics simulations to investigate the tension effect on the phonon bandgap and the compression induced instability of the monolayer MoS2. Our key finding is that the phonon bandgap can be narrowed by the uniaxial tension, and is completely closed at ε = 0.145; while the biaxial tension only has a limited effect on the phonon bandgap. We also demonstrate the compression induced buckling for the monolayer MoS2. The critical strain for buckling is extracted from the band structure analysis of the flexure mode in the monolayer MoS2 and is further verified by molecular dynamics simulations and the Euler buckling theory. Our study illustrates the uniaxial tension as an efficient method for manipulating the phonon bandgap of the monolayer MoS2, while the biaxial compression as a powerful tool to intrigue buckling in the monolayer MoS2.

  20. Imaging spectroscopic ellipsometry of MoS2.

    PubMed

    Funke, S; Miller, B; Parzinger, E; Thiesen, P; Holleitner, A W; Wurstbauer, U

    2016-09-28

    Micromechanically exfoliated mono- and multilayers of molybdenum disulfide (MoS2) are investigated by spectroscopic imaging ellipsometry. In combination with knife edge illumination, MoS2 flakes can be detected and classified on arbitrary flat and also transparent substrates with a lateral resolution down to 1-2 µm. The complex dielectric functions from mono- and trilayer MoS2 are presented. They are extracted from a multilayer model to fit the measured ellipsometric angles employing an anisotropic and an isotropic fit approach. We find that the energies of the critical points of the optical constants can be treated to be independent of the utilized model, whereas the magnitude of the optical constants varies with the used model. The anisotropic model suggests a maximum absorbance for a MoS2 sheet supported by sapphire of about 14% for monolayer and of 10% for trilayer MoS2. Furthermore, the lateral homogeneity of the complex dielectric function for monolayer MoS2 is investigated with a spatial resolution of 2 µm. Only minor fluctuations are observed. No evidence for strain, for a significant amount of disorder or lattice defects can be found in the wrinkle-free regions of the MoS2 monolayer from complementary µ-Raman spectroscopy measurements. We assume that the minor lateral variation in the optical constants are caused by lateral modification in the van der Waals interaction presumably caused by the preparation using micromechanical exfoliation and viscoelastic stamping. PMID:27460278

  1. Programmable, automated transistor test system

    NASA Technical Reports Server (NTRS)

    Truong, L. V.; Sundburg, G. R.

    1986-01-01

    A programmable, automated transistor test system was built to supply experimental data on new and advanced power semiconductors. The data will be used for analytical models and by engineers in designing space and aircraft electric power systems. A pulsed power technique was used at low duty cycles in a nondestructive test to examine the dynamic switching characteristic curves of power transistors in the 500 to 1000 V, 10 to 100 A range. Data collection, manipulation, storage, and output are operator interactive but are guided and controlled by the system software.

  2. Recovery of damage in rad-hard MOS devices during and after irradiation by electrons, protons, alphas, and gamma rays

    NASA Technical Reports Server (NTRS)

    Brucker, G. J.; Van Gunten, O.; Stassinopoulos, E. G.; Shapiro, P.; August, L. S.; Jordan, T. M.

    1983-01-01

    This paper reports on the recovery properties of rad-hard MOS devices during and after irradiation by electrons, protons, alphas, and gamma rays. The results indicated that complex recovery properties controlled the damage sensitivities of the tested parts. The results also indicated that damage sensitivities depended on dose rate, total dose, supply bias, gate bias, transistor type, radiation source, and particle energy. The complex nature of these dependencies make interpretation of LSI device performance in space (exposure to entire electron and proton spectra) difficult, if not impossible, without respective ground tests and analyses. Complete recovery of n-channel shifts was observed, in some cases within hours after irradiation, with equilibrium values of threshold voltages greater than their pre-irradiation values. This effect depended on total dose, radiation source, and gate bias during exposure. In contrast, the p-channel shifts recovered only 20 percent within 30 days after irradiation.

  3. Experimental study on vertical scaling of InAs-on-insulator metal-oxide-semiconductor field-effect transistors

    SciTech Connect

    Kim, SangHyeon E-mail: sh-kim@kist.re.kr; Yokoyama, Masafumi; Nakane, Ryosho; Takenaka, Mitsuru; Takagi, Shinichi; Ichikawa, Osamu; Osada, Takenori; Hata, Masahiko

    2014-06-30

    We have investigated effects of the vertical scaling on electrical properties in extremely thin-body InAs-on-insulator (-OI) metal-oxide-semiconductor field-effect transistors (MOSFETs). It is found that the body thickness (T{sub body}) scaling provides better short channel effect (SCE) control, whereas the T{sub body} scaling also causes the reduction of the mobility limited by channel thickness fluctuation (δT{sub body}) scattering (μ{sub fluctuation}). Also, in order to achieve better SCEs control, the thickness of InAs channel layer (T{sub channel}) scaling is more favorable than the thickness of MOS interface buffer layer (T{sub buffer}) scaling from a viewpoint of a balance between SCEs control and μ{sub fluctuation} reduction. These results indicate necessity of quantum well channel structure in InAs-OI MOSFETs and these should be considered in future transistor design.

  4. Silicon on insulator self-aligned transistors

    DOEpatents

    McCarthy, Anthony M.

    2003-11-18

    A method for fabricating thin-film single-crystal silicon-on-insulator (SOI) self-aligned transistors. Standard processing of silicon substrates is used to fabricate the transistors. Physical spaces, between the source and gate, and the drain and gate, introduced by etching the polysilicon gate material, are used to provide connecting implants (bridges) which allow the transistor to perform normally. After completion of the silicon substrate processing, the silicon wafer is bonded to an insulator (glass) substrate, and the silicon substrate is removed leaving the transistors on the insulator (glass) substrate. Transistors fabricated by this method may be utilized, for example, in flat panel displays, etc.

  5. Photoconductivities in MoS2 Nanoflake Photoconductors

    NASA Astrophysics Data System (ADS)

    Shen, Wei-Chu; Chen, Ruei-San; Huang, Ying-Sheng

    2016-03-01

    Photoconductivities in molybdenum disulfide (MoS2) layered nanostructures with two-hexagonal crystalline structure prepared by mechanical exfoliation were investigated. The photoconductor-type MoS2 nanoflakes exhibit remarkable photoresponse under the above bandgap excitation wavelength of 532 nm at different optical intensity. The photocurrent responsivity and photoconductive gain of nanoflakes can reach, respectively, 30 AW-1 and 103 at the intensity of 50 Wm-2, which are several orders of magnitude higher than those of their bulk counterparts. The vacuum-enhanced photocurrent and power-independent responsivity/gain indicate a surface-controlled photoconduction mechanism in the MoS2 nanomaterial.

  6. Electronic system for data acquisition to study radiation effects on operating MOSFET transistors

    SciTech Connect

    Alves de Oliveira, Juliano; Assis de Melo, Marco Antônio; Guazzelli da Silveira, Marcilei A.; Medina, Nilberto H.

    2014-11-11

    In this work we present the development of an acquisition system for characterizing transistors under X-ray radiation. The system is able to carry out the acquisition and to storage characteristic transistor curves. To test the acquisition system we have submitted polarized P channel MOS transistors under continuous 10-keV X-ray doses up to 1500 krad. The characterization system can operate in the saturation region or in the linear region in order to observe the behavior of the currents or voltages involved during the irradiation process. Initial tests consisted of placing the device under test (DUT) in front of the X-ray beam direction, while its drain current was constantly monitored through the prototype generated in this work, the data are stored continuously and system behavior was monitored during the test. In order to observe the behavior of the DUT during the radiation tests, we used an acquisition system that consists of an ultra-low consumption16-bit Texas Instruments MSP430 microprocessor. Preliminary results indicate linear behavior of the voltage as a function of the exposure time and fast recovery. These features may be favorable to use this device as a radiation dosimeter to monitor low rate X-ray.

  7. Electronic system for data acquisition to study radiation effects on operating MOSFET transistors

    NASA Astrophysics Data System (ADS)

    de Oliveira, Juliano Alves; de Melo, Marco Antônio Assis; da Silveira, Marcilei A. Guazzelli; Medina, Nilberto H.

    2014-11-01

    In this work we present the development of an acquisition system for characterizing transistors under X-ray radiation. The system is able to carry out the acquisition and to storage characteristic transistor curves. To test the acquisition system we have submitted polarized P channel MOS transistors under continuous 10-keV X-ray doses up to 1500 krad. The characterization system can operate in the saturation region or in the linear region in order to observe the behavior of the currents or voltages involved during the irradiation process. Initial tests consisted of placing the device under test (DUT) in front of the X-ray beam direction, while its drain current was constantly monitored through the prototype generated in this work, the data are stored continuously and system behavior was monitored during the test. In order to observe the behavior of the DUT during the radiation tests, we used an acquisition system that consists of an ultra-low consumption16-bit Texas Instruments MSP430 microprocessor. Preliminary results indicate linear behavior of the voltage as a function of the exposure time and fast recovery. These features may be favorable to use this device as a radiation dosimeter to monitor low rate X-ray.

  8. Analysing organic transistors based on interface approximation

    SciTech Connect

    Akiyama, Yuto; Mori, Takehiko

    2014-01-15

    Temperature-dependent characteristics of organic transistors are analysed thoroughly using interface approximation. In contrast to amorphous silicon transistors, it is characteristic of organic transistors that the accumulation layer is concentrated on the first monolayer, and it is appropriate to consider interface charge rather than band bending. On the basis of this model, observed characteristics of hexamethylenetetrathiafulvalene (HMTTF) and dibenzotetrathiafulvalene (DBTTF) transistors with various surface treatments are analysed, and the trap distribution is extracted. In turn, starting from a simple exponential distribution, we can reproduce the temperature-dependent transistor characteristics as well as the gate voltage dependence of the activation energy, so we can investigate various aspects of organic transistors self-consistently under the interface approximation. Small deviation from such an ideal transistor operation is discussed assuming the presence of an energetically discrete trap level, which leads to a hump in the transfer characteristics. The contact resistance is estimated by measuring the transfer characteristics up to the linear region.

  9. Black phosphorus nonvolatile transistor memory.

    PubMed

    Lee, Dain; Choi, Yongsuk; Hwang, Euyheon; Kang, Moon Sung; Lee, Seungwoo; Cho, Jeong Ho

    2016-04-28

    We demonstrated nanofloating gate transistor memory devices (NFGTMs) using mechanically-exfoliated few-layered black phosphorus (BP) channels and gold nanoparticle (AuNPs) charge trapping layers. The resulting BP-NFGTMs exhibited excellent memory performances, including the five-level data storage, large memory window (58.2 V), stable retention (10(4) s), and cyclic endurance (1000 cycles). PMID:27074903

  10. The four-gate transistor

    NASA Technical Reports Server (NTRS)

    Mojarradi, M. M.; Cristoveanu, S.; Allibert, F.; France, G.; Blalock, B.; Durfrene, B.

    2002-01-01

    The four-gate transistor or G4-FET combines MOSFET and JFET principles in a single SOI device. Experimental results reveal that each gate can modulate the drain current. Numerical simulations are presented to clarify the mechanisms of operation. The new device shows enhanced functionality, due to the combinatorial action of the four gates, and opens rather revolutionary applications.

  11. Electrical transport and low-frequency noise in chemical vapor deposited single-layer MoS2 devices.

    PubMed

    Sharma, Deepak; Amani, Matin; Motayed, Abhishek; Shah, Pankaj B; Birdwell, A Glen; Najmaei, Sina; Ajayan, Pulickel M; Lou, Jun; Dubey, Madan; Li, Qiliang; Davydov, Albert V

    2014-04-18

    We have studied temperature-dependent (77-300 K) electrical characteristics and low-frequency noise (LFN) in chemical vapor deposited (CVD) single-layer molybdenum disulfide (MoS2) based back-gated field-effect transistors (FETs). Electrical characterization and LFN measurements were conducted on MoS2 FETs with Al2O3 top-surface passivation. We also studied the effect of top-surface passivation etching on the electrical characteristics of the device. Significant decrease in channel current and transconductance was observed in these devices after the Al2O3 passivation etching. For passivated devices, the two-terminal resistance variation with temperature showed a good fit to the activation energy model, whereas for the etched devices the trend indicated a hopping transport mechanism. A significant increase in the normalized drain current noise power spectral density (PSD) was observed after the etching of the top passivation layer. The observed channel current noise was explained using a standard unified model incorporating carrier number fluctuation and correlated surface mobility fluctuation mechanisms. Detailed analysis of the gate-referred noise voltage PSD indicated the presence of different trapping states in passivated devices when compared to the etched devices. Etched devices showed weak temperature dependence of the channel current noise, whereas passivated devices exhibited near-linear temperature dependence. PMID:24642948

  12. Improved linearity and reliability in GaN metal-oxide-semiconductor high-electron-mobility transistors using nanolaminate La2O3/SiO2 gate dielectric

    NASA Astrophysics Data System (ADS)

    Hsu, Ching-Hsiang; Shih, Wang-Cheng; Lin, Yueh-Chin; Hsu, Heng-Tung; Hsu, Hisang-Hua; Huang, Yu-Xiang; Lin, Tai-Wei; Wu, Chia-Hsun; Wu, Wen-Hao; Maa, Jer-Shen; Iwai, Hiroshi; Kakushima, Kuniyuki; Chang, Edward Yi

    2016-04-01

    Improved device performance to enable high-linearity power applications has been discussed in this study. We have compared the La2O3/SiO2 AlGaN/GaN metal-oxide-semiconductor high-electron-mobility transistors (MOS-HEMTs) with other La2O3-based (La2O3/HfO2, La2O3/CeO2 and single La2O3) MOS-HEMTs. It was found that forming lanthanum silicate films can not only improve the dielectric quality but also can improve the device characteristics. The improved gate insulation, reliability, and linearity of the 8 nm La2O3/SiO2 MOS-HEMT were demonstrated.

  13. Scalable fabrication of a hybrid field-effect and acousto-electric device by direct growth of monolayer MoS2/LiNbO3

    NASA Astrophysics Data System (ADS)

    Preciado, Edwin; Schülein, Florian J. R.; Nguyen, Ariana E.; Barroso, David; Isarraraz, Miguel; von Son, Gretel; Lu, I.-Hsi; Michailow, Wladislaw; Möller, Benjamin; Klee, Velveth; Mann, John; Wixforth, Achim; Bartels, Ludwig; Krenner, Hubert J.

    2015-10-01

    Lithium niobate is the archetypical ferroelectric material and the substrate of choice for numerous applications including surface acoustic wave radio frequencies devices and integrated optics. It offers a unique combination of substantial piezoelectric and birefringent properties, yet its lack of optical activity and semiconducting transport hamper application in optoelectronics. Here we fabricate and characterize a hybrid MoS2/LiNbO3 acousto-electric device via a scalable route that uses millimetre-scale direct chemical vapour deposition of MoS2 followed by lithographic definition of a field-effect transistor structure on top. The prototypical device exhibits electrical characteristics competitive with MoS2 devices on silicon. Surface acoustic waves excited on the substrate can manipulate and probe the electrical transport in the monolayer device in a contact-free manner. We realize both a sound-driven battery and an acoustic photodetector. Our findings open directions to non-invasive investigation of electrical properties of monolayer films.

  14. Scalable fabrication of a hybrid field-effect and acousto-electric device by direct growth of monolayer MoS2/LiNbO3

    PubMed Central

    Preciado, Edwin; Schülein, Florian J.R.; Nguyen, Ariana E.; Barroso, David; Isarraraz, Miguel; von Son, Gretel; Lu, I-Hsi; Michailow, Wladislaw; Möller, Benjamin; Klee, Velveth; Mann, John; Wixforth, Achim; Bartels, Ludwig; Krenner, Hubert J.

    2015-01-01

    Lithium niobate is the archetypical ferroelectric material and the substrate of choice for numerous applications including surface acoustic wave radio frequencies devices and integrated optics. It offers a unique combination of substantial piezoelectric and birefringent properties, yet its lack of optical activity and semiconducting transport hamper application in optoelectronics. Here we fabricate and characterize a hybrid MoS2/LiNbO3 acousto-electric device via a scalable route that uses millimetre-scale direct chemical vapour deposition of MoS2 followed by lithographic definition of a field-effect transistor structure on top. The prototypical device exhibits electrical characteristics competitive with MoS2 devices on silicon. Surface acoustic waves excited on the substrate can manipulate and probe the electrical transport in the monolayer device in a contact-free manner. We realize both a sound-driven battery and an acoustic photodetector. Our findings open directions to non-invasive investigation of electrical properties of monolayer films. PMID:26493867

  15. Scalable fabrication of a hybrid field-effect and acousto-electric device by direct growth of monolayer MoS2/LiNbO3.

    PubMed

    Preciado, Edwin; Schülein, Florian J R; Nguyen, Ariana E; Barroso, David; Isarraraz, Miguel; von Son, Gretel; Lu, I-Hsi; Michailow, Wladislaw; Möller, Benjamin; Klee, Velveth; Mann, John; Wixforth, Achim; Bartels, Ludwig; Krenner, Hubert J

    2015-01-01

    Lithium niobate is the archetypical ferroelectric material and the substrate of choice for numerous applications including surface acoustic wave radio frequencies devices and integrated optics. It offers a unique combination of substantial piezoelectric and birefringent properties, yet its lack of optical activity and semiconducting transport hamper application in optoelectronics. Here we fabricate and characterize a hybrid MoS2/LiNbO3 acousto-electric device via a scalable route that uses millimetre-scale direct chemical vapour deposition of MoS2 followed by lithographic definition of a field-effect transistor structure on top. The prototypical device exhibits electrical characteristics competitive with MoS2 devices on silicon. Surface acoustic waves excited on the substrate can manipulate and probe the electrical transport in the monolayer device in a contact-free manner. We realize both a sound-driven battery and an acoustic photodetector. Our findings open directions to non-invasive investigation of electrical properties of monolayer films. PMID:26493867

  16. Biaxial Strain Engineering in Suspended MoS2

    NASA Astrophysics Data System (ADS)

    Lloyd, David; Liu, Xinghui; Cantley, Lauren; Koch, Eric; Yang, Guang; Boddeti, Narasimha; Dunn, Martin L.; Bunch, J. Scott; Bunch Team

    2015-03-01

    Monolayer MoS2 is a direct gap semiconductor and has attracted significant interest for its potential uses in electronics and optoelectronics. It has also been shown to have a highly strain-sensitive bandgap and can sustain strains of up to 11 percent, making it ideally suited for using strain engineering to tune it's electrical and optical properties. Herein, we fabricate pressurized MoS2 blisters using single and few layer MoS2 membranes suspended over cylindrical microcavities. By applying a pressure difference across the membrane and measuring the changes to it's photoluminescence spectrumwe study the effect of elastic biaxial strain engineering on the bandgap of MoS2.

  17. Ferromagnetism in freestanding MoS2 nanosheets

    PubMed Central

    2013-01-01

    Freestanding MoS2 nanosheets with different sizes were prepared through a simple exfoliated method by tuning the ultrasonic time in the organic solvent. Magnetic measurement results reveal the clear room-temperature ferromagnetism for all the MoS2 nanosheets, in contrast to the pristine MoS2 in its bulk form which shows diamagnetism only. Furthermore, results indicate that the saturation magnetizations of the nanosheets increase as the size decreases. Combining the X-ray photoelectron spectroscopy, transmission electron microscopy, and electron spin resonance results, it is suggested that the observed magnetization is related to the presence of edge spins on the edges of the nanosheets. These MoS2 nanosheets may find applications in nanodevices and spintronics by controlling the edge structures. PMID:23496904

  18. Extended life testing evaluation of complementary MOS integrated circuits

    NASA Technical Reports Server (NTRS)

    Brosnan, T. E.

    1972-01-01

    The purpose of the extended life testing evaluation of complementary MOS integrated circuits was twofold: (1) To ascertain the long life capability of complementary MOS devices. (2) To assess the objectivity and reliability of various accelerated life test methods as an indication or prediction tool. In addition, the determination of a suitable life test sequence for these devices was of importance. Conclusions reached based on the parts tested and the test results obtained was that the devices were not acceptable.

  19. Interaction between genes Mos and mwh expressed in somatic cells of Drosophila melanogaster

    SciTech Connect

    Vaisman, N.Ya.; Zakharov, I.K.

    1995-07-01

    Gene Mosaic (Mos) of chromosome 3 of Drosophila melanogaster was located by means of dominant markers Ly, Sb, and Dr. This gene was shown to be located between Ly and Sb in the centromeric region (45-50 map units). An analysis of interaction between Mos and mwh genes in cis- and trans-heterozygotes showed a significant effect of the Mos gene on mutability (recombinogenesis) of chromosome mwh in somatic cells. In the cis heterozygote mwh Mos/++, the frequency of small mutant clones on wings of flies increased. In mwh/Mos heterozygotes, the Mos gene caused a significant reduction of dorsocentral and scutellar bristles (78% in mwh/Mos, 85% in mwh +/+ Mos, and 98% in mwh Mos/mwh +). 20 refs., 3 tabs.

  20. Ab initio studies of phoshorene island single electron transistor.

    PubMed

    Ray, S J; Venkata Kamalakar, M; Chowdhury, R

    2016-05-18

    Phosphorene is a newly unveiled two-dimensional crystal with immense potential for nanoelectronic and optoelectronic applications. Its unique electronic structure and two dimensionality also present opportunities for single electron devices. Here we report the behaviour of a single electron transistor (SET) made of a phosphorene island, explored for the first time using ab initio calculations. We find that the band gap and the charging energy decrease monotonically with increasing layer numbers due to weak quantum confinement. When compared to two other novel 2D crystals such as graphene and MoS2, our investigation reveals larger adsorption energies of gas molecules on phosphorene, which indicates better a sensing ability. The calculated charge stability diagrams show distinct changes in the presence of an individual molecule which can be applied to detect the presence of different molecules with sensitivity at a single molecular level. The higher charging energies of the molecules within the SET display operational viability at room temperature, which is promising for possible ultra sensitive detection applications. PMID:27093536

  1. Ab initio studies of phosphorene island single electron transistor

    NASA Astrophysics Data System (ADS)

    Ray, S. J.; Venkata Kamalakar, M.; Chowdhury, R.

    2016-05-01

    Phosphorene is a newly unveiled two-dimensional crystal with immense potential for nanoelectronic and optoelectronic applications. Its unique electronic structure and two dimensionality also present opportunities for single electron devices. Here we report the behaviour of a single electron transistor (SET) made of a phosphorene island, explored for the first time using ab initio calculations. We find that the band gap and the charging energy decrease monotonically with increasing layer numbers due to weak quantum confinement. When compared to two other novel 2D crystals such as graphene and MoS2, our investigation reveals larger adsorption energies of gas molecules on phosphorene, which indicates better a sensing ability. The calculated charge stability diagrams show distinct changes in the presence of an individual molecule which can be applied to detect the presence of different molecules with sensitivity at a single molecular level. The higher charging energies of the molecules within the SET display operational viability at room temperature, which is promising for possible ultra sensitive detection applications.

  2. Device performance simulations of multilayer black phosphorus tunneling transistors

    NASA Astrophysics Data System (ADS)

    Liu, Fei; Shi, Qing; Wang, Jian; Guo, Hong

    2015-11-01

    We report a theoretical investigation of ballistic transport in multilayer black phosphorus (BP) tunneling transistors (TFETs) with HfO2 as the gate oxide. First-principles calculations show that monolayer BP can be preserved well on HfO2 (111) surface. For a better device performance, the optimum layer and transport direction at different channel lengths are investigated. It is shown that BP TFETs have larger drain current in the armchair direction (AD) than in the zigzag direction, and the current difference can be several orders of magnitude. On-state current can be enhanced in the BP TFETs using thicker BP film, while the minimal leakage current is increased at the same time. To reduce the leakage current and subthreshold swing in the multilayer BP TFETs, lower source/drain doping concentration and smaller drain voltage should be applied. Compared to monolayer MoS2, MoSe2, and MoTe2 TFETs monolayer BP TFETs in AD can reach larger on-state current at the same Ion/Ioff ratio.

  3. An excellent weight-updating-linearity EEPROM synapse memory cell for self-learning neuron-MOS neural networks

    SciTech Connect

    Kosaka, Hideo; Shibata, Tadashi; Ishii, Hiroshi; Ohmi, Tadahiro )

    1995-01-01

    A new synapse memory cell employing floating-gate EEPROM technology has been developed which is characterized by an excellent weight-updating linearity under the constant-pulse programming. Such a feature has been realized for the first time by employing a simple self-feedback regime in each cell circuitry. The potential of the floating gate is set to the tunneling electrode by the source follower action of the built-in cell circuitry, thus assuring a constant electric field strength in the tunnel oxide at each programming cycle independent of the stored charge in the floating gate. The synapse cell is composed of only seven transistors and inherits all the advanced features of their original six-transistor cell, such as the standby-power free and dual polarity characteristics. In addition, by optimizing the intra-cell coupling capacitance ratios, the acceleration effect in updating the weight has also been accomplished. All these features make the new synapse cell fully compatible with the hardware learning architecture of the Neuron-MOS neural network. The new synapse cell concept has been verified by experiments using test circuits fabricated by a double-polysilicon CMOS process.

  4. Metamorphosis of the transistor into a laser

    NASA Astrophysics Data System (ADS)

    Feng, M.; Holonyak, N., Jr.

    2015-01-01

    Based on the invention and operation of the transistor, the alloy diode laser, the quantum-well diode laser and the high-speed heterojunction bipolar transistor (HBT), we have invented and realized now a transistor laser (TL). The transistor laser is a three-terminal technology providing coupling and the coherent light emission in the transistor. The quantum-well (QW) heterojunction bipolar transistor laser, inherently a fast switching device, operates by transporting a small minority base charge density ˜1016 \\text{cm}-3 over a nanoscale base thickness (<900 \\text{A}) in picoseconds. The TL, owing to its fast recombination speed, its unique three-terminal configuration, and complementary nature of its optical and electrical collector output signals, enables resonance-free base current and collector voltage modulation. It is a compact source of electro-optical applications such as nonlinear signal mixing, frequency multiplication, negative feedback, and optoelectronics logic gates.

  5. A monolithic lead sulfide-silicon MOS integrated-circuit structure

    NASA Technical Reports Server (NTRS)

    Jhabvala, M. D.; Barrett, J. R.

    1982-01-01

    A technique is developed for directly integrating infrared photoconductive PbS detector material with MOS transistors. A layer of chromium, instead of aluminum, is deposited followed by a gold deposition in order to ensure device survival during the chemical deposition of the PbS. Among other devices, a structure was fabricated and evaluated in which the PbS was directly coupled to the gate of a PMOS. The external bias, load, and source resistors were connected and the circuit was operated as a source-follower amplifier. Radiometric evaluations were performed on a variety of different MOSFETs of different geometry. In addition, various detector elements were simultaneously fabricated to demonstrate small element capability, and it was shown that elements of 25 x 25 microns could easily be fabricated. Results of room temperature evaluations using a filtered 700 K black body source yielded a detectivity at peak wavelength of 10 to the 11th cm (root Hz)/W at 100 Hz chopping frequency.

  6. Black phosphorus-monolayer MoS2 van der Waals heterojunction p-n diode.

    PubMed

    Deng, Yexin; Luo, Zhe; Conrad, Nathan J; Liu, Han; Gong, Yongji; Najmaei, Sina; Ajayan, Pulickel M; Lou, Jun; Xu, Xianfan; Ye, Peide D

    2014-08-26

    Phosphorene, a elemental 2D material, which is the monolayer of black phosphorus, has been mechanically exfoliated recently. In its bulk form, black phosphorus shows high carrier mobility (∼10,000 cm(2)/V·s) and a ∼0.3 eV direct band gap. Well-behaved p-type field-effect transistors with mobilities of up to 1000 cm(2)/V·s, as well as phototransistors, have been demonstrated on few-layer black phosphorus, showing its promise for electronics and optoelectronics applications due to its high hole mobility and thickness-dependent direct band gap. However, p–n junctions, the basic building blocks of modern electronic and optoelectronic devices, have not yet been realized based on black phosphorus. In this paper, we demonstrate a gate-tunable p–n diode based on a p-type black phosphorus/n-type monolayer MoS2 van der Waals p–n heterojunction. Upon illumination, these ultrathin p–n diodes show a maximum photodetection responsivity of 418 mA/W at the wavelength of 633 nm and photovoltaic energy conversion with an external quantum efficiency of 0.3%. These p–n diodes show promise for broad-band photodetection and solar energy harvesting. PMID:25019534

  7. Large Work Function Modulation of Monolayer MoS2 by Ambient Gases.

    PubMed

    Lee, Si Young; Kim, Un Jeong; Chung, JaeGwan; Nam, Honggi; Jeong, Hye Yun; Han, Gang Hee; Kim, Hyun; Oh, Hye Min; Lee, Hyangsook; Kim, Hyochul; Roh, Young-Geun; Kim, Jineun; Hwang, Sung Woo; Park, Yeonsang; Lee, Young Hee

    2016-06-28

    Although two-dimensional monolayer transition-metal dichalcogenides reveal numerous unique features that are inaccessible in bulk materials, their intrinsic properties are often obscured by environmental effects. Among them, work function, which is the energy required to extract an electron from a material to vacuum, is one critical parameter in electronic/optoelectronic devices. Here, we report a large work function modulation in MoS2 via ambient gases. The work function was measured by an in situ Kelvin probe technique and further confirmed by ultraviolet photoemission spectroscopy and theoretical calculations. A measured work function of 4.04 eV in vacuum was converted to 4.47 eV with O2 exposure, which is comparable with a large variation in graphene. The homojunction diode by partially passivating a transistor reveals an ideal junction with an ideality factor of almost one and perfect electrical reversibility. The estimated depletion width obtained from photocurrent mapping was ∼200 nm, which is much narrower than bulk semiconductors. PMID:27232340

  8. A SPICE Model and Electrostatic Field Analysis of the MOS Turn-Off Thyristor

    SciTech Connect

    Kelly, D Q; Mayhall, D J; Wilson, M J; Lahowe, D A

    2002-08-05

    This paper presents a circuit model and an electrostatic field analysis with an approximate model of the SDM170HK MOS turn-off thyristor (MTO) fabricated by Silicon Power Corporation. The circuit model consists of five cells, each containing two bipolar junction transistors and three resistors. The turn-off feature of the MTO was simulated by inserting an array of 21 Fairchild FDS6670A MOSFET importable sub-circuit components between the cathode and the turn-on gate. The model was then used to create a four-terminal sub-circuit component representing the MTO that can be readily imported into computer-aided circuit design programs such as PSPICE and Micro-Cap. The generated static I-V characteristics and simulated switching waveforms are shown. The electrostatic field analysis was done for the maximum operating voltage of 4.5 kV using the Ansoft Maxwell 3D field simulator. Electrostatic field magnitudes that exceed the nominal air breakdown threshold of 30 kV/cm were observed surrounding the simulated turn-off gate wire, the turn-off gate ring contact, and the cathode ring contact. The resulting areas of high fields are a concern, as arc track marks have been found on the inner surface of the ceramic insulator near the internal gate connections of a failed device.

  9. An RF Energy Harvester System Using UHF Micropower CMOS Rectifier Based on a Diode Connected CMOS Transistor

    PubMed Central

    Shokrani, Mohammad Reza; Hamidon, Mohd Nizar B.; Rokhani, Fakhrul Zaman; Shafie, Suhaidi Bin

    2014-01-01

    This paper presents a new type diode connected MOS transistor to improve CMOS conventional rectifier's performance in RF energy harvester systems for wireless sensor networks in which the circuits are designed in 0.18 μm TSMC CMOS technology. The proposed diode connected MOS transistor uses a new bulk connection which leads to reduction in the threshold voltage and leakage current; therefore, it contributes to increment of the rectifier's output voltage, output current, and efficiency when it is well important in the conventional CMOS rectifiers. The design technique for the rectifiers is explained and a matching network has been proposed to increase the sensitivity of the proposed rectifier. Five-stage rectifier with a matching network is proposed based on the optimization. The simulation results shows 18.2% improvement in the efficiency of the rectifier circuit and increase in sensitivity of RF energy harvester circuit. All circuits are designed in 0.18 μm TSMC CMOS technology. PMID:24782680

  10. An RF energy harvester system using UHF micropower CMOS rectifier based on a diode connected CMOS transistor.

    PubMed

    Shokrani, Mohammad Reza; Khoddam, Mojtaba; Hamidon, Mohd Nizar B; Kamsani, Noor Ain; Rokhani, Fakhrul Zaman; Shafie, Suhaidi Bin

    2014-01-01

    This paper presents a new type diode connected MOS transistor to improve CMOS conventional rectifier's performance in RF energy harvester systems for wireless sensor networks in which the circuits are designed in 0.18  μm TSMC CMOS technology. The proposed diode connected MOS transistor uses a new bulk connection which leads to reduction in the threshold voltage and leakage current; therefore, it contributes to increment of the rectifier's output voltage, output current, and efficiency when it is well important in the conventional CMOS rectifiers. The design technique for the rectifiers is explained and a matching network has been proposed to increase the sensitivity of the proposed rectifier. Five-stage rectifier with a matching network is proposed based on the optimization. The simulation results shows 18.2% improvement in the efficiency of the rectifier circuit and increase in sensitivity of RF energy harvester circuit. All circuits are designed in 0.18 μm TSMC CMOS technology. PMID:24782680

  11. Tuning on-off current ratio and field-effect mobility in a MoS(2)-graphene heterostructure via Schottky barrier modulation.

    PubMed

    Shih, Chih-Jen; Wang, Qing Hua; Son, Youngwoo; Jin, Zhong; Blankschtein, Daniel; Strano, Michael S

    2014-06-24

    Field-effect transistor (FET) devices composed of a MoS2-graphene heterostructure can combine the advantages of high carrier mobility in graphene with the permanent band gap of MoS2 for digital applications. Herein, we investigate the electron transfer, photoluminescence, and gate-controlled carrier transport in such a heterostructure. We show that the junction is a Schottky barrier, whose height can be artificially controlled by gating or doping graphene. When the applied gate voltage (or the doping level) is zero, the photoexcited electron-hole pairs in monolayer MoS2 can be split by the heterojunction, significantly reducing the photoluminescence. By applying negative gate voltage (or p-doping) in graphene, the interlayer impedance formed between MoS2 and graphene exhibits an 100-fold increase. For the first time, we show that the gate-controlled interlayer Schottky impedance can be utilized to modulate carrier transport in graphene, significantly depleting the hole transport, but preserving the electron transport. Accordingly, we demonstrate a new type of FET device, which enables a controllable transition from NMOS digital to bipolar characteristics. In the NMOS digital regime, we report a very high room temperature on/off current ratio (ION/IOFF ∼ 36) in comparison to graphene-based FET devices without sacrificing the field-effect electron mobilities in graphene. By engineering the source/drain contact area, we further estimate that a higher value of ION/IOFF up to 100 can be obtained in the device architecture considered. The device architecture presented here may enable semiconducting behavior in graphene for digital and analogue electronics. PMID:24824139

  12. Investigations on MgO-dielectric GaN/AlGaN/GaN MOS-HEMTs by using an ultrasonic spray pyrolysis deposition technique

    NASA Astrophysics Data System (ADS)

    Lee, Ching-Sung; Hsu, Wei-Chou; Liu, Han-Yin; Wu, Ting-Ting; Sun, Wen-Ching; Wei, Sung-Yen; Yu, Sheng-Min

    2016-05-01

    This work investigates GaN/Al0.24Ga0.76N/GaN metal-oxide-semiconductor high electron mobility transistors (MOS-HEMTs) grown on a Si substrate with MgO gate dielectric by using the non-vacuum ultrasonic spray pyrolysis deposition (USPD) technique. The oxide layer thickness is tuned to be 30 nm with the dielectric constant of 8.8. Electron spectroscopy for chemical analysis (ESCA), secondary ion mass spectrometry (SIMS), atomic force microscopy (AFM), transmission electron microscopy (TEM), C-V, low-frequency noise spectra, and pulsed I-V measurements are performed to characterize the interface and oxide quality for the MOS-gate structure. Improved device performances have been successfully achieved for the present MOS-HEMT (Schottky-gate HEMT) design, consisting of a maximum drain-source current density (I DS, max) of 681 (500) mA/mm at V GS = 4 (2) V, I DS at V GS = 0 V (I DSS0) of 329 (289) mA/mm, gate-voltage swing (GVS) of 2.2 (1.6) V, two-terminal gate-drain breakdown voltage (BV GD) of -123 (-104) V, turn-on voltage (V on) of 1.7 (0.8) V, three-terminal off-state drain-source breakdown voltage (BV DS) of 119 (96) V, and on/off current ratio (I on/I off) of 2.5 × 108 (1.2 × 103) at 300 K. Improved high-frequency and power performances are also achieved in the present MOS-HEMT design.

  13. Black phosphorus nonvolatile transistor memory

    NASA Astrophysics Data System (ADS)

    Lee, Dain; Choi, Yongsuk; Hwang, Euyheon; Kang, Moon Sung; Lee, Seungwoo; Cho, Jeong Ho

    2016-04-01

    We demonstrated nanofloating gate transistor memory devices (NFGTMs) using mechanically-exfoliated few-layered black phosphorus (BP) channels and gold nanoparticle (AuNPs) charge trapping layers. The resulting BP-NFGTMs exhibited excellent memory performances, including the five-level data storage, large memory window (58.2 V), stable retention (104 s), and cyclic endurance (1000 cycles).We demonstrated nanofloating gate transistor memory devices (NFGTMs) using mechanically-exfoliated few-layered black phosphorus (BP) channels and gold nanoparticle (AuNPs) charge trapping layers. The resulting BP-NFGTMs exhibited excellent memory performances, including the five-level data storage, large memory window (58.2 V), stable retention (104 s), and cyclic endurance (1000 cycles). Electronic supplementary information (ESI) available. See DOI: 10.1039/c6nr02078j

  14. Principles of an atomtronic transistor

    NASA Astrophysics Data System (ADS)

    Caliga, Seth C.; Straatsma, Cameron J. E.; Zozulya, Alex A.; Anderson, Dana Z.

    2016-01-01

    A semiclassical formalism is used to investigate the transistor-like behavior of ultracold atoms in a triple-well potential. Atom current flows from the source well, held at fixed chemical potential and temperature, into an empty drain well. In steady-state, the gate well located between the source and drain is shown to acquire a well-defined chemical potential and temperature, which are controlled by the relative height of the barriers separating the three wells. It is shown that the gate chemical potential can exceed that of the source and have a lower temperature. In electronics terminology, the source-gate junction can be reverse-biased. As a result, the device exhibits regimes of negative resistance and transresistance, indicating the presence of gain. Given an external current input to the gate, transistor-like behavior is characterized both in terms of the current gain, which can be greater than unity, and the power output of the device.

  15. Coaxial inverted geometry transistor having buried emitter

    NASA Technical Reports Server (NTRS)

    Hruby, R. J.; Cress, S. B.; Dunn, W. R. (Inventor)

    1973-01-01

    The invention relates to an inverted geometry transistor wherein the emitter is buried within the substrate. The transistor can be fabricated as a part of a monolithic integrated circuit and is particularly suited for use in applications where it is desired to employ low actuating voltages. The transistor may employ the same doping levels in the collector and emitter, so these connections can be reversed.

  16. Single-transistor-clocked flip-flop

    DOEpatents

    Zhao, Peiyi; Darwish, Tarek; Bayoumi, Magdy

    2005-08-30

    The invention provides a low power, high performance flip-flop. The flip-flop uses only one clocked transistor. The single clocked transistor is shared by the first and second branches of the device. A pulse generator produces a clock pulse to trigger the flip-flop. In one preferred embodiment the device can be made as a static explicit pulsed flip-flop which employs only two clocked transistors.

  17. A graphene-based hot electron transistor.

    PubMed

    Vaziri, Sam; Lupina, Grzegorz; Henkel, Christoph; Smith, Anderson D; Ostling, Mikael; Dabrowski, Jarek; Lippert, Gunther; Mehr, Wolfgang; Lemme, Max C

    2013-04-10

    We experimentally demonstrate DC functionality of graphene-based hot electron transistors, which we call graphene base transistors (GBT). The fabrication scheme is potentially compatible with silicon technology and can be carried out at the wafer scale with standard silicon technology. The state of the GBTs can be switched by a potential applied to the transistor base, which is made of graphene. Transfer characteristics of the GBTs show ON/OFF current ratios exceeding 10(4). PMID:23488893

  18. The creation of the magnetic and metallic characteristics in low-width MoS 2 nanoribbon (1D MoS 2): A DFT study

    NASA Astrophysics Data System (ADS)

    Shidpour, Reza; Manteghian, Merhrdad

    2009-06-01

    A basic understanding of the catalytic performance is needed to probe the physical properties that change with a reduction in the catalytic clusters size. It has been shown that the edge of low-width MoS2 nanoribbon has a metallic characteristic, while that of bulk MoS2 has a semi-conductive characteristic. For probing the observations, we constructed the models representing the surface atoms and the edge atoms of the MoS2 nanoribbon. The nanoribbon-like model can also be used to model the edge atoms of the nanocluster MoS2 .Then we calculated the density of states (DOS) of infinitely two-dimensional MoS2 and of the structure corresponding to the edge atoms of the MoS2 nanoribbon-like structure with Wien2K software. The magnetic moment of structures was calculated for identifying the magnetic structure. We found that the bulk MoS2 and infinitely two-dimensional MoS2 are semi-conductive and not magnetic, while the computation model corresponding to MoS2 nanoribbon is metallic. The calculation anticipates that the edges of the MoS2 nanocluster and the low-width MoS2 nanoribbon are strongly magnetic.

  19. Monolayer-by-monolayer stacked pyramid-like MoS2 nanodots on monolayered MoS2 flakes with enhanced photoluminescence.

    PubMed

    Yuan, Cailei; Cao, Yingjie; Luo, Xingfang; Yu, Ting; Huang, Zhenping; Xu, Bo; Yang, Yong; Li, Qinliang; Gu, Gang; Lei, Wen

    2015-11-01

    The precise control of the morphology and crystal shape of MoS2 nanostructures is of particular importance for their application in nanoelectronic and optoelectronic devices. Here, we describe a single step route for the synthesis of monolayer-by-monolayer stacked pyramid-like MoS2 nanodots on monolayered MoS2 flakes using a chemical vapor deposition method. First-principles calculations demonstrated that the bandgap of the pyramid-like MoS2 nanodot is a direct bandgap. Enhanced local photoluminescence emission was observed in the pyramid-like MoS2 nanodot, in comparison with monolayered MoS2 flakes. The findings presented here provide new opportunities to tailor the physical properties of MoS2via morphology-controlled synthesis. PMID:26439853

  20. Monolayer-by-monolayer stacked pyramid-like MoS2 nanodots on monolayered MoS2 flakes with enhanced photoluminescence

    NASA Astrophysics Data System (ADS)

    Yuan, Cailei; Cao, Yingjie; Luo, Xingfang; Yu, Ting; Huang, Zhenping; Xu, Bo; Yang, Yong; Li, Qinliang; Gu, Gang; Lei, Wen

    2015-10-01

    The precise control of the morphology and crystal shape of MoS2 nanostructures is of particular importance for their application in nanoelectronic and optoelectronic devices. Here, we describe a single step route for the synthesis of monolayer-by-monolayer stacked pyramid-like MoS2 nanodots on monolayered MoS2 flakes using a chemical vapor deposition method. First-principles calculations demonstrated that the bandgap of the pyramid-like MoS2 nanodot is a direct bandgap. Enhanced local photoluminescence emission was observed in the pyramid-like MoS2 nanodot, in comparison with monolayered MoS2 flakes. The findings presented here provide new opportunities to tailor the physical properties of MoS2via morphology-controlled synthesis.

  1. Complementary junction heterostructure field-effect transistor

    DOEpatents

    Baca, Albert G.; Drummond, Timothy J.; Robertson, Perry J.; Zipperian, Thomas E.

    1995-01-01

    A complimentary pair of compound semiconductor junction heterostructure field-effect transistors and a method for their manufacture are disclosed. The p-channel junction heterostructure field-effect transistor uses a strained layer to split the degeneracy of the valence band for a greatly improved hole mobility and speed. The n-channel device is formed by a compatible process after removing the strained layer. In this manner, both types of transistors may be independently optimized. Ion implantation is used to form the transistor active and isolation regions for both types of complimentary devices. The invention has uses for the development of low power, high-speed digital integrated circuits.

  2. Complementary junction heterostructure field-effect transistor

    DOEpatents

    Baca, A.G.; Drummond, T.J.; Robertson, P.J.; Zipperian, T.E.

    1995-12-26

    A complimentary pair of compound semiconductor junction heterostructure field-effect transistors and a method for their manufacture are disclosed. The p-channel junction heterostructure field-effect transistor uses a strained layer to split the degeneracy of the valence band for a greatly improved hole mobility and speed. The n-channel device is formed by a compatible process after removing the strained layer. In this manner, both types of transistors may be independently optimized. Ion implantation is used to form the transistor active and isolation regions for both types of complimentary devices. The invention has uses for the development of low power, high-speed digital integrated circuits. 10 figs.

  3. Surface Defects on Natural MoS2.

    PubMed

    Addou, Rafik; Colombo, Luigi; Wallace, Robert M

    2015-06-10

    Transition metal dichalcogenides (TMDs) are being considered for a variety of electronic and optoelectronic devices such as beyond complementary metal-oxide-semiconductor (CMOS) switches, light-emitting diodes, solar cells, as well as sensors, among others. Molybdenum disulfide (MoS2) is the most studied of the TMDs in part because of its availability in the natural or geological form. The performance of most devices is strongly affected by the intrinsic defects in geological MoS2. Indeed, most sources of current transition metal dichalcogenides have defects, including many impurities. The variability in the electrical properties of MoS2 across the surface of the same crystal has been shown to be correlated with local variations in stoichiometry as well as metallic-like and structural defects. The presence of impurities has also been suggested to play a role in determining the Fermi level in MoS2. The main focus of this work is to highlight a number of intrinsic defects detected on natural, exfoliated MoS2 crystals from two different sources that have been often used in previous reports for device fabrication. We employed room temperature scanning tunneling microscopy (STM) and spectroscopy (STS), inductively coupled plasma mass spectrometry (ICPMS), as well as X-ray photoelectron spectroscopy (XPS) to study the pristine surface of MoS2(0001) immediately after exfoliation. ICPMS used to measure the concentration of impurity elements can in part explain the local contrast behavior observed in STM images. This work highlights that the high concentration of surface defects and impurity atoms may explain the variability observed in the electrical and physical characteristics of MoS2. PMID:25980312

  4. Self-screened high performance multi-layer MoS₂ transistor formed by using a bottom graphene electrode.

    PubMed

    Qu, Deshun; Liu, Xiaochi; Ahmed, Faisal; Lee, Daeyeong; Yoo, Won Jong

    2015-12-01

    We investigated the carrier transport in multi-layer MoS2 with consideration of the contact resistance (R(c)) and interlayer resistance (R(int)). A bottom graphene contact was suggested to overcome the degradation of I(d) modulation in a back gated multi-layer MoS2 field effect transistor (FET) due to the accumulated R(int) and increased R(c) with increasing thickness. As a result, non-degraded drain current (I(d)) modulation with increasing flake thickness was achieved due to the non-cumulative R(int). Benefiting from the low R(c) induced by the negligible Schottky barrier at the graphene/MoS2 interface, the intrinsic carrier transport properties immune to R(c) were investigated in the multi-layer MoS2 FET. ∼2 times the enhanced carrier mobility was attained from the self-screened channel in the bottom graphene contacted device, compared to those with top metal contacts. PMID:26531884

  5. Electrical Properties of Synthesized Large-Area MoS₂ Field-Effect Transistors Fabricated with Inkjet-Printed Contacts.

    PubMed

    Kim, Tae-Young; Amani, Matin; Ahn, Geun Ho; Song, Younggul; Javey, Ali; Chung, Seungjun; Lee, Takhee

    2016-02-23

    We report the electrical properties of synthesized large-area monolayer molybdenum disulfide (MoS2) field-effect transistors (FETs) with low-cost inkjet-printed Ag electrodes. The monolayer MoS2 film was grown by a chemical vapor deposition (CVD) method, and the top-contact Ag source/drain electrodes (S/D) were deposited onto the films using a low-cost drop-on-demand inkjet-printing process without any masks and surface treatments. The electrical characteristics of FETs were comparable to those fabricated by conventional deposition methods such as photo- or electron beam lithography. The contact properties between the S/D and the semiconductor layer were also evaluated using the Y-function method and an analysis of the output characteristic at the low drain voltage regimes. Furthermore, the electrical instability under positive gate-bias stress was studied to investigate the charge-trapping mechanism of the FETs. CVD-grown large-area monolayer MoS2 FETs with inkjet-printed contacts may represent an attractive approach for realizing large-area and low-cost thin-film electronics. PMID:26820160

  6. Spike-timing dependent plasticity in a transistor-selected resistive switching memory

    NASA Astrophysics Data System (ADS)

    Ambrogio, S.; Balatti, S.; Nardi, F.; Facchinetti, S.; Ielmini, D.

    2013-09-01

    In a neural network, neuron computation is achieved through the summation of input signals fed by synaptic connections. The synaptic activity (weight) is dictated by the synchronous firing of neurons, inducing potentiation/depression of the synaptic connection. This learning function can be supported by the resistive switching memory (RRAM), which changes its resistance depending on the amplitude, the pulse width and the bias polarity of the applied signal. This work shows a new synapse circuit comprising a MOS transistor as a selector and a RRAM as a variable resistance, displaying spike-timing dependent plasticity (STDP) similar to the one originally experienced in biological neural networks. We demonstrate long-term potentiation and long-term depression by simulations with an analytical model of resistive switching. Finally, the experimental demonstration of the new STDP scheme is presented.

  7. Spike-timing dependent plasticity in a transistor-selected resistive switching memory.

    PubMed

    Ambrogio, S; Balatti, S; Nardi, F; Facchinetti, S; Ielmini, D

    2013-09-27

    In a neural network, neuron computation is achieved through the summation of input signals fed by synaptic connections. The synaptic activity (weight) is dictated by the synchronous firing of neurons, inducing potentiation/depression of the synaptic connection. This learning function can be supported by the resistive switching memory (RRAM), which changes its resistance depending on the amplitude, the pulse width and the bias polarity of the applied signal. This work shows a new synapse circuit comprising a MOS transistor as a selector and a RRAM as a variable resistance, displaying spike-timing dependent plasticity (STDP) similar to the one originally experienced in biological neural networks. We demonstrate long-term potentiation and long-term depression by simulations with an analytical model of resistive switching. Finally, the experimental demonstration of the new STDP scheme is presented. PMID:23999495

  8. Remarkably high mobility ultra-thin-film metal-oxide transistor with strongly overlapped orbitals

    PubMed Central

    Wei Shih, Chen; Chin, Albert; Fu Lu, Chun; Fang Su, Wei

    2016-01-01

    High mobility channel thin-film-transistor (TFT) is crucial for both display and future generation integrated circuit. We report a new metal-oxide TFT that has an ultra-thin 4.5 nm SnO2 thickness for both active channel and source-drain regions, very high 147 cm2/Vs field-effect mobility, high ION/IOFF of 2.3 × 107, small 110 mV/dec sub-threshold slope, and a low VD of 2.5 V for low power operation. This mobility is already better than chemical-vapor-deposition grown multi-layers MoS2 TFT. From first principle quantum-mechanical calculation, the high mobility TFT is due to strongly overlapped orbitals. PMID:26744240

  9. Remarkably high mobility ultra-thin-film metal-oxide transistor with strongly overlapped orbitals

    NASA Astrophysics Data System (ADS)

    Wei Shih, Chen; Chin, Albert; Fu Lu, Chun; Fang Su, Wei

    2016-01-01

    High mobility channel thin-film-transistor (TFT) is crucial for both display and future generation integrated circuit. We report a new metal-oxide TFT that has an ultra-thin 4.5 nm SnO2 thickness for both active channel and source-drain regions, very high 147 cm2/Vs field-effect mobility, high ION/IOFF of 2.3 × 107, small 110 mV/dec sub-threshold slope, and a low VD of 2.5 V for low power operation. This mobility is already better than chemical-vapor-deposition grown multi-layers MoS2 TFT. From first principle quantum-mechanical calculation, the high mobility TFT is due to strongly overlapped orbitals.

  10. Remarkably high mobility ultra-thin-film metal-oxide transistor with strongly overlapped orbitals.

    PubMed

    Shih, Chen Wei; Chin, Albert; Lu, Chun Fu; Su, Wei Fang

    2016-01-01

    High mobility channel thin-film-transistor (TFT) is crucial for both display and future generation integrated circuit. We report a new metal-oxide TFT that has an ultra-thin 4.5 nm SnO2 thickness for both active channel and source-drain regions, very high 147 cm(2)/Vs field-effect mobility, high ION/IOFF of 2.3 × 10(7), small 110 mV/dec sub-threshold slope, and a low VD of 2.5 V for low power operation. This mobility is already better than chemical-vapor-deposition grown multi-layers MoS2 TFT. From first principle quantum-mechanical calculation, the high mobility TFT is due to strongly overlapped orbitals. PMID:26744240

  11. BIMOS transistor solutions for ESD protection in FD-SOI UTBB CMOS technology

    NASA Astrophysics Data System (ADS)

    Galy, Philippe; Athanasiou, S.; Cristoloveanu, S.

    2016-01-01

    We evaluate the Electro-Static Discharge (ESD) protection capability of BIpolar MOS (BIMOS) transistors integrated in ultrathin silicon film for 28 nm Fully Depleted SOI (FD-SOI) Ultra Thin Body and BOX (UTBB) high-k metal gate technology. Using as a reference our measurements in hybrid bulk-SOI structures, we extend the BIMOS design towards the ultrathin silicon film. Detailed study and pragmatic evaluations are done based on 3D TCAD simulation with standard physical models using Average Current Slope (ACS) method and quasi-static DC stress (Average Voltage Slope AVS method). These preliminary 3D TACD results are very encouraging in terms of ESD protection efficiency in advanced FD-SOI CMOS.

  12. Study of charge control and gate tunneling in a ferroelectric-oxide-silicon field effect transistor: Comparison with a conventional metal-oxide-silicon structure

    NASA Astrophysics Data System (ADS)

    Lin, Yih-Yin; Zhang, Yifei; Singh, Jasprit; York, Robert; Mishra, Umesh

    2001-02-01

    It is known that conventional metal-oxide-silicon (MOS) devices will have gate tunneling related problems at very thin oxide thicknesses. Various high-dielectric-constant materials are being examined to suppress the gate currents. In this article we present theoretical results of a charge control and gate tunneling model for a ferroelectric-oxide-silicon field effect transistor and compare them to results for a conventional MOS device. The potential of high polarization charge to induce inversion without doping and high dielectric constant to suppress tunneling current is explored. The model is based on a self-consistent solution of the quantum problem and includes the ferroelectric hysteresis response self-consistently. We show that the polarization charge associated with ferroelectrics can allow greater controllability of the inversion layer charge density. Also the high dielectric constant of ferroelectrics results in greatly suppressed gate current.

  13. Excitation intensity dependence of photoluminescence from monolayers of MoS2 and WS2/MoS2 heterostructures

    NASA Astrophysics Data System (ADS)

    Kaplan, D.; Gong, Y.; Mills, K.; Swaminathan, V.; Ajayan, P. M.; Shirodkar, S.; Kaxiras, E.

    2016-03-01

    A detailed study of the excitation dependence of the photoluminescence (PL) from monolayers of MoS2 and WS2/MoS2 heterostructures grown by chemical vapor deposition on Si substrates has revealed that the luminescence from band edge excitons from MoS2 monolayers shows a linear dependence on excitation intensity for both above band gap and resonant excitation conditions. In particular, a band separated by ∼55 meV from the A exciton, referred to as the C band, shows the same linear dependence on excitation intensity as the band edge excitons. A band similar to the C band has been previously ascribed to a trion, a charged, three-particle exciton. However, in our study the C band does not show the 3/2 power dependence on excitation intensity as would be expected for a three-particle exciton. Further, the PL from the MoS2 monolayer in a bilayer WS2/MoS2 heterostructure, under resonant excitation conditions where only the MoS2 absorbs the laser energy, also revealed a linear dependence on excitation intensity for the C band, confirming that its origin is not due to a trion but instead a bound exciton, presumably of an unintentional impurity or a native point defect such as a sulfur vacancy. The PL from the WS2/MoS2 heterostructure, under resonant excitation conditions also showed additional features which are suggested to arise from the interface states at the heteroboundary. Further studies are required to clearly identify the origin of these features.

  14. MoS2 actuators: reversible mechanical responses of MoS2-polymer nanocomposites to photons.

    PubMed

    Fan, Xiaoming; Khosravi, Farhad; Rahneshin, Vahid; Shanmugam, Mariyappan; Loeian, Masoud; Jasinski, Jacek; Cohn, Robert W; Terentjev, Eugene; Panchapakesan, Balaji

    2015-07-01

    New molybdenum disulfide (MoS2)-based polymer composites and their reversible mechanical responses to light are presented, suggesting MoS2 as an excellent candidate for energy conversion. Homogeneous mixtures of MoS2/polydimethylsiloxane (PDMS) nanocomposites (0.1-5 wt.%) were prepared and their near infrared (NIR) mechanical responses studied with increasing pre-strains. NIR triggering resulted in an extraordinary change in stress levels of the actuators by ~490 times. Actuation responses of MoS2 polymer composites depended on applied pre-strains. At lower levels of pre-strains (3-9%) the actuators showed reversible expansion while at high levels (15-50%), the actuators exhibited reversible contraction. An opto-mechanical conversion (η)∼0.5-3 MPa W(-1) was calculated. The ratio of maximum stress due to photo-actuation (σmax) at 50% strain to the minimum stress due to photo-actuation (σmin) at 3% strain was found to be ∼315-322% for MoS2 actuators (for 0.1 to 5 wt.% additive), greater than single layer graphene (∼188%) and multi-wall nanotube (∼172%) photo-mechanical actuators. Unlike other photomechanical actuators, the MoS2 actuators exhibited strong light-matter interactions and an unambiguous increase in amplitude of photomechanical response with increasing strains. A power law dependence of σmax/σmin on strains with a scaling exponent of β = 0.87-1.32 was observed, suggesting that the origin of photomechanical response is intertwined dynamically with the molecular mechanisms at play in MoS2 actuators. PMID:26056744

  15. MoS2 actuators: reversible mechanical responses of MoS2-polymer nanocomposites to photons

    NASA Astrophysics Data System (ADS)

    Fan, Xiaoming; Khosravi, Farhad; Rahneshin, Vahid; Shanmugam, Mariyappan; Loeian, Masoud; Jasinski, Jacek; Cohn, Robert W.; Terentjev, Eugene; Panchapakesan, Balaji

    2015-07-01

    New molybdenum disulfide (MoS2)-based polymer composites and their reversible mechanical responses to light are presented, suggesting MoS2 as an excellent candidate for energy conversion. Homogeneous mixtures of MoS2/polydimethylsiloxane (PDMS) nanocomposites (0.1-5 wt.%) were prepared and their near infrared (NIR) mechanical responses studied with increasing pre-strains. NIR triggering resulted in an extraordinary change in stress levels of the actuators by ~490 times. Actuation responses of MoS2 polymer composites depended on applied pre-strains. At lower levels of pre-strains (3-9%) the actuators showed reversible expansion while at high levels (15-50%), the actuators exhibited reversible contraction. An opto-mechanical conversion (η)˜0.5-3 MPa W-1 was calculated. The ratio of maximum stress due to photo-actuation (σmax) at 50% strain to the minimum stress due to photo-actuation (σmin) at 3% strain was found to be ˜315-322% for MoS2 actuators (for 0.1 to 5 wt.% additive), greater than single layer graphene (˜188%) and multi-wall nanotube (˜172%) photo-mechanical actuators. Unlike other photomechanical actuators, the MoS2 actuators exhibited strong light-matter interactions and an unambiguous increase in amplitude of photomechanical response with increasing strains. A power law dependence of σmax/σmin on strains with a scaling exponent of β = 0.87-1.32 was observed, suggesting that the origin of photomechanical response is intertwined dynamically with the molecular mechanisms at play in MoS2 actuators.

  16. High frequency MoS2 nanomechanical resonators.

    PubMed

    Lee, Jaesung; Wang, Zenghui; He, Keliang; Shan, Jie; Feng, Philip X-L

    2013-07-23

    Molybdenum disulfide (MoS2), a layered semiconducting material in transition metal dichalcogenides (TMDCs), as thin as a monolayer (consisting of a hexagonal plane of Mo atoms covalently bonded and sandwiched between two planes of S atoms, in a trigonal prismatic structure), has demonstrated unique properties and strong promises for emerging two-dimensional (2D) nanodevices. Here we report on the demonstration of movable and vibrating MoS2 nanodevices, where MoS2 diaphragms as thin as 6 nm (a stack of 9 monolayers) exhibit fundamental-mode nanomechanical resonances up to f0 ~ 60 MHz in the very high frequency (VHF) band, and frequency-quality (Q) factor products up to f0 × Q ~ 2 × 10(10)Hz, all at room temperature. The experimental results from many devices with a wide range of thicknesses and lateral sizes, in combination with theoretical analysis, quantitatively elucidate the elastic transition regimes in these ultrathin MoS2 nanomechanical resonators. We further delineate a roadmap for scaling MoS2 2D resonators and transducers toward microwave frequencies. This study also opens up possibilities for new classes of vibratory devices to exploit strain- and dynamics-engineered ultrathin semiconducting 2D crystals. PMID:23738924

  17. Phonon thermal conductivity of monolayer MoS2

    NASA Astrophysics Data System (ADS)

    Wang, Xiaonan; Tabarraei, Alireza

    2016-05-01

    We use nonequilibrium molecular dynamics modeling using Stillinger-Weber interatomic potential to investigate the thermal properties of monolayer molybdenum disulfide (MoS2) nanoribbons. We study the impact of factors such as length, edge chirality, monovacancies, and uniaxial stretching on the thermal conductivity of MoS2 nanoribbons. Our results show that longer ribbons have a higher thermal conductivity, and the thermal conductivity of infinitely long zigzag and armchair MoS2 nanoribbons is, respectively, 54 W/mK and 33 W/mK. This is significantly lower than the thermal conductivity of some other graphene-like two-dimensional materials such as graphene and boron nitride. While the presence of molybdenum or sulfur vacancies reduces the thermal conductivity of ribbons, molybdenum vacancies have a more deteriorating effect on thermal conductivities. We also have studied the impact of uniaxial stretching on the thermal conductivity of MoS2 nanoribbons. The results show that in contrast to three dimensional materials, thermal conductivity of MoS2 is fairly insensitive to stretching. We have used the phonon dispersion curves and group velocities to investigate the mechanism of this unexpected behavior. Our results show that tensile strain does not alter the phonon dispersion curves and hence the thermal conductivity does not change.

  18. Thickness-Dependent Interfacial Coulomb Scattering in Atomically Thin Field-Effect Transistors

    NASA Astrophysics Data System (ADS)

    Li, Song-Lin; Wakabayashi, Katsunori; Xu, Yong; Nakaharai, Shu; Komatsu, Katsuyoshi; Li, Wen-Wu; Lin, Yen-Fu; Aparecido-Ferreira, Alex; Tsukagoshi, Kazuhito

    2013-08-01

    Two-dimensional semiconductors are structurally ideal channel materials for the ultimate atomic electronics after silicon era. A long-standing puzzle is the low carrier mobility ({\\mu}) in them as compared with corresponding bulk structures, which constitutes the main hurdle for realizing high-performance devices. To address this issue, we perform combined experimental and theoretical study on atomically thin MoS2 field effect transistors with varying the number of MoS2 layers (NLs). Experimentally, an intimate relation is observed with a 10-fold degradation in {\\mu} for extremely thinned monolayer channels. To accurately describe the carrier scattering process and shed light on the origin of the thinning-induced mobility degradation, a generalized Coulomb scattering model is developed with strictly considering device configurative conditions, i.e., asymmetric dielectric environments and lopsided carrier distribution. We reveal that the carrier scattering from interfacial Coulomb impurities (e.g., chemical residues, gaseous adsorbates and surface dangling bonds) is greatly intensified in extremely thinned channels, resulting from shortened interaction distance between impurities and carriers. Such a pronounced factor may surpass lattice phonons and serve as dominant scatterers. This understanding offers new insight into the thickness induced scattering intensity, highlights the critical role of surface quality in electrical transport and would lead to rational performance improvement strategies for future atomic electronics.

  19. In Situ Synthesis of Carbon Nanotube Hybrids with Alternate MoC and MoS2 to Enhance the Electrochemical Activities of MoS2.

    PubMed

    Li, Xin; Zhang, Jinying; Wang, Rui; Huang, Hongyang; Xie, Chong; Li, Zhihui; Li, Jun; Niu, Chunming

    2015-08-12

    Molybdenum disulfides and carbides are effective catalysts for hydrogenation and hydridesulfurization, where MoS2 nanostructures are also highly promising materials for lithium ion batteries. High surface-to-volume ratio and strong interactions with conducting networks are crucial factors for their activities. A new hybrid structure of multiwalled carbon nanotube (MWCNT) with alternate MoC nanoparticles and MoS2 nanosheets (MoS2 + MoC-MWCNT) has been synthesized by controlled carburization of core-shell MoS2-MWCNT hybrid nanotubes and demonstrated by HRTEM, FFT, XRD, and Raman scattering. The MoS2 nanosheets (∼10 nm) remain tightly connected to MWCNT surfaces with {001} planes in parallel to MWCNT walls and the highly crystallized α-MoC particles (∼10 nm) are adhered to MWCNTs at angles of 60-80° between {111} planes and MWCNT walls. The electrochemical performances of the hybrid structures have been demonstrated as anodes for lithium ion batteries to be significantly increased by breaking MoS2 nanotubes into nanosheets (patches) on MWCNT surfaces, especially at high current rates. The specific capacities of MoS2 + MoC-MWCNT sample with ∼23% MoS2 have been demonstrated to be higher than those of MoS2-MWCNTs containing ∼70% MoS2. PMID:26226386

  20. Controlling Transistor Temperature During Burn-In

    NASA Technical Reports Server (NTRS)

    Scott, B. C.

    1986-01-01

    Boiling refrigerant provides simple temperature control for newly manufactured power transistors. Heat-transfer liquid is Fluorinert FC-77 (or equivalent). Liquid boils at 100 degrees C, which is specified temperature at which transistor cases should be maintained during burn-in with this technique.

  1. Transistor h parameter conversion slide rule

    NASA Technical Reports Server (NTRS)

    Brantner, R. E.

    1967-01-01

    Slide rule enables the ready conversion of transistor h parameters from one form to another and reduces calculation time by a factor of 5 to 10. The scales are selected to cover all ranges of each parameter that will normally exist for any transistor, and answers are given in the correct order of magnitude, making powers-of-ten calculations unnecessary.

  2. Pass transistor implementations of multivalued logic

    NASA Technical Reports Server (NTRS)

    Maki, G.; Whitaker, S.

    1990-01-01

    A simple straight-forward Karnaugh map logic design procedure for realization of multiple-valued logic circuits is presented in this paper. Pass transistor logic gates are used to realize multiple-valued networks. This work is an extension of pass transistor implementations for binary-valued logic.

  3. Band gap engineering of MoS2 upon compression

    NASA Astrophysics Data System (ADS)

    López-Suárez, Miquel; Neri, Igor; Rurali, Riccardo

    2016-04-01

    Molybdenum disulfide (MoS2) is a promising candidate for 2D nanoelectronic devices, which shows a direct band-gap for monolayer structure. In this work we study the electronic structure of MoS2 upon both compressive and tensile strains with first-principles density-functional calculations for different number of layers. The results show that the band-gap can be engineered for experimentally attainable strains (i.e., ±0.15). However, compressive strain can result in bucking that can prevent the use of large compressive strain. We then studied the stability of the compression, calculating the critical strain that results in the on-set of buckling for free-standing nanoribbons of different lengths. The results demonstrate that short structures, or few-layer MoS2, show semi-conductor to metal transition upon compressive strain without bucking.

  4. Synthesis of Large Scale MoS2 -Graphene Heterostructures

    NASA Astrophysics Data System (ADS)

    McCreary, Kathleen; Hanbicki, Aubrey; Friedman, Adam; Robinson, Jeremy; Jonker, Berend

    2014-03-01

    A rapidly progressing field involves the stacking of multiple two dimensional materials to form heterostructures. These heterosctructures have exhibited unique and interesting properties. For the most part, heterostructure devices are produced via mechanical exfoliation followed by careful aligning and stacking of the various components, limiting dimensions to micron-scale devices. Chemical vapor deposition (CVD) has proven to be a useful tool in the production of graphene and has very recently been investigated as a means for the growth of other 2D materials such as MoS2, hexagonal boron nitride and WS2. Using a two-step CVD process we are able to synthesize MoS2 on CVD grown graphene. AFM and Raman microscopy of the MoS2-graphene heterostructure show a uniform and continuous film on the cm scale.

  5. Towards an optimised sputtered MoS2 lubricant film

    NASA Technical Reports Server (NTRS)

    Roberts, E. W.

    1986-01-01

    It is shown that the tribological quality of MoS2 lubricant films formed by magnetron sputtering is determined by the choice of sputtering conditions. By selecting the appropriate conditions, films of extremely high lubricity and endurance (in vacuum), which are well suited to many space applications, are obtained. Such MoS2 films, when applied to precision ball hearings, give rise to the lowest torques (for the given test conditions) yet seen in our laboratory. While a remarkably good performance is obtained in vacuum, tests in air show a marked deterioration in lubricating qualities. It is demonstrated that this is attributable to the adsorption of water vapor on MoS2 surfaces and that the degree of deterioration is related to the partial pressure of water vapor present. Analysis of results indicates that the factors relevant to obtaining optimum films are deposition rate and film composition.

  6. Plasmons on the edge of MoS2 nanostructures

    NASA Astrophysics Data System (ADS)

    Andersen, Kirsten; Jacobsen, Karsten W.; Thygesen, Kristian S.

    2014-10-01

    Using ab initio calculations we predict the existence of one-dimensional (1D), atomically confined plasmons at the edges of a zigzag MoS2 nanoribbon. The strongest plasmon originates from a metallic edge state localized on the sulfur dimers decorating the Mo edge of the ribbon. A detailed analysis of the dielectric function reveals that the observed deviations from the ideal 1D plasmon behavior result from single-particle transitions between the metallic edge state and the valence and conduction bands of the MoS2 sheet. The Mo and S edges of the ribbon are clearly distinguishable in calculated spatially resolved electron energy loss spectrum owing to the different plasmonic properties of the two edges. The edge plasmons could potentially be utilized for tuning the photocatalytic activity of MoS2 nanoparticles.

  7. Photoconductivities in MoS2 Nanoflake Photoconductors.

    PubMed

    Shen, Wei-Chu; Chen, Ruei-San; Huang, Ying-Sheng

    2016-12-01

    Photoconductivities in molybdenum disulfide (MoS2) layered nanostructures with two-hexagonal crystalline structure prepared by mechanical exfoliation were investigated. The photoconductor-type MoS2 nanoflakes exhibit remarkable photoresponse under the above bandgap excitation wavelength of 532 nm at different optical intensity. The photocurrent responsivity and photoconductive gain of nanoflakes can reach, respectively, 30 AW(-1) and 103 at the intensity of 50 Wm(-2), which are several orders of magnitude higher than those of their bulk counterparts. The vacuum-enhanced photocurrent and power-independent responsivity/gain indicate a surface-controlled photoconduction mechanism in the MoS2 nanomaterial. PMID:26935304

  8. Defects Engineered Monolayer MoS2 for Improved Hydrogen Evolution Reaction

    DOE PAGESBeta

    Ye, Gonglan; Gong, Yongji; Lin, Junhao; Li, Bo; He, Yongmin; Pantelides, Sokrates T.; Zhou, Wu; Vajtai, Robert; Ajayan, Pulickel M.

    2016-01-13

    MoS2 is a promising, low-cost material for electrochemical hydrogen production due to its high activity and stability during the reaction. Our work represents an easy method to increase the hydrogen production in electrochemical reaction of MoS2 via defect engineering, and helps to understand the catalytic properties of MoS2.

  9. Effects of Bio-Mos on growth and survival of channel catfish challenged with Edwardsiella ictaluri

    Technology Transfer Automated Retrieval System (TEKTRAN)

    Research examined the effects of Bio-Mos on growth and disease resistance in channel catfish. Catfish were fed either a Con-Sink (36% crude protein (CP) diet) or Bio-Mos-Sink (36% CP diet with Bio-Mos supplemented at 2 g/kg) sinking pellet for 6 wks. followed by an E. ictaluri challenge. Growth pe...

  10. Magnetoamplification in a Bipolar Magnetic Junction Transistor

    NASA Astrophysics Data System (ADS)

    Rangaraju, N.; Peters, J. A.; Wessels, B. W.

    2010-09-01

    We have demonstrated the first bipolar magnetic junction transistor using a dilute magnetic semiconductor. For an InMnAs p-n-p transistor magnetoamplification is observed at room temperature. The observed magnetoamplification is attributed to the magnetoresistance of the magnetic semiconductor InMnAs heterojunction. The magnetic field dependence of the transistor characteristics confirm that the magnetoamplification results from the junction magnetoresistance. To describe the experimentally observed transistor characteristics, we propose a modified Ebers-Moll model that includes a series magnetoresistance attributed to spin-selective conduction. The capability of magnetic field control of the amplification in an all-semiconductor transistor at room temperature potentially enables the creation of new computer logic architecture where the spin of the carriers is utilized.

  11. Universal power transistor base drive control unit

    DOEpatents

    Gale, A.R.; Gritter, D.J.

    1988-06-07

    A saturation condition regulator system for a power transistor is disclosed which achieves the regulation objectives of a Baker clamp but without dumping excess base drive current into the transistor output circuit. The base drive current of the transistor is sensed and used through an active feedback circuit to produce an error signal which modulates the base drive current through a linearly operating FET. The collector base voltage of the power transistor is independently monitored to develop a second error signal which is also used to regulate base drive current. The current-sensitive circuit operates as a limiter. In addition, a fail-safe timing circuit is disclosed which automatically resets to a turn OFF condition in the event the transistor does not turn ON within a predetermined time after the input signal transition. 2 figs.

  12. Universal power transistor base drive control unit

    DOEpatents

    Gale, Allan R.; Gritter, David J.

    1988-01-01

    A saturation condition regulator system for a power transistor which achieves the regulation objectives of a Baker clamp but without dumping excess base drive current into the transistor output circuit. The base drive current of the transistor is sensed and used through an active feedback circuit to produce an error signal which modulates the base drive current through a linearly operating FET. The collector base voltage of the power transistor is independently monitored to develop a second error signal which is also used to regulate base drive current. The current-sensitive circuit operates as a limiter. In addition, a fail-safe timing circuit is disclosed which automatically resets to a turn OFF condition in the event the transistor does not turn ON within a predetermined time after the input signal transition.

  13. Validity and reliability of Arabic MOS social support survey.

    PubMed

    Dafaalla, Mohamed; Farah, Abdulraheem; Bashir, Sheima; Khalil, Ammar; Abdulhamid, Rabab; Mokhtar, Mousab; Mahadi, Mohamed; Omer, Zulfa; Suliman, Asgad; Elkhalifa, Mohammed; Abdelgadir, Hanin; Kheir, Abdelmoneim E M; Abdalrahman, Ihab

    2016-01-01

    We aimed to generate a valid reliable Arabic version of MOS social support survey (MOS-SSS). We did a cross sectional study in medical students of Faculty of Medicine in Khartoum, Sudan. We did a clustered random sampling in 500 students of which 487 were suitable for analysis. We followed the standard translation process for translating the MOS-SSS. We accomplished factor analysis to assess construct validity, and generated item-scales correlations to evaluate the convergent and discriminant validity. We extracted the Cronbach's α and Spearman Brown coefficient of spit half method to determine internal consistency. We measured stability by correlation between the scores of the MOS survey taken at two different occasions with ten days apart in 252 participants. All items correlated highly (0.788 or greater) with their hypothesized scales. All items in subscales correlated higher by two standard errors with their own scale than with any other scale. Principle component analysis with varimax rotation was conducted on the 19 items and examination of scree plot graphically suggested 4 predominant factors that account for 72 % of variance. It showed high loadings, ranging from 0.720 to 0.84 for items of emotional support, 0.699-0.845 for tangible support, 0.518-0.823 for affectionate support, and 0.740-0.816 for positive social interaction. Cronbach's alpha for overall MOS scale and subscales indicated high internal consistency. The test-retest correlation showed weak correlation between the test and retest (ranges from 0.04 to 0.104). The Arabic MOS-SSS had high validity and internal consistency. PMID:27547680

  14. Matching properties, and voltage and temperature dependence of MOS capacitors

    NASA Astrophysics Data System (ADS)

    McCreary, J. L.

    1981-12-01

    A technique for designing MOS capacitor arrays is discussed, which includes a method of calculating capacitance ratio errors and subsequent total yield. Data illustrating the sensitivity of the ratio matching to capacitor layout, structures, and technology are presented, and measured voltage coefficients of MOS capacitors as function of surface concentration are compared with the calculated coefficients. It is demonstrated that the temperature dependence of space charge capacitance, thermal expansion, and temperature dependence of the dielectric constant are the major components of the temperature coefficient of capacitance. It is also shown that to a first-order, heavily doped polysilicon accumulates and depletes similar to crystalline silicon.

  15. Formation of nanosized monolayer MoS2 by oxygen-assisted thinning of multilayer MoS2

    NASA Astrophysics Data System (ADS)

    Neupane, Guru P.; Dhakal, Krishna P.; Kim, Hyun; Lee, Jubok; Kim, Min Su; Han, Ganghee; Lee, Young Hee; Kim, Jeongyong

    2016-08-01

    We report the controllable nanosized local thinning of multi-layer (2 L and 3 L)-thickness MoS2 films down to the monolayer (1 L) thickness using the simple method of annealing in a dry oxygen atmosphere. The annealing temperature was optimized in the range of 240 °C to 270 °C for 1.5 h, and 1 L thick nanosized pits were developed on the uniform film of the 2 L and 3 L MoS2 grown using the chemical vapor deposition method. We characterized the formation of the 1 L nanosized pits using nanoscale confocal photoluminescence (PL) and Raman spectroscopy. We observed that the PL intensity increased and the Raman frequency shifted, representative of the characteristics of 1 L MoS2 films. A subsequent hydrogen treatment process was useful for removing the oxygen-induced doping effect resulting from the annealing.

  16. Functionalization of Two-Dimensional MoS2 : On the Reaction Between MoS2 and Organic Thiols.

    PubMed

    Chen, Xin; Berner, Nina C; Backes, Claudia; Duesberg, Georg S; McDonald, Aidan R

    2016-05-01

    Two-dimensional layered transition metal dichalcogenides (TMDs) have attracted great interest owing to their unique properties and a wide array of potential applications. However, due to their inert nature, pristine TMDs are very challenging to functionalize. We demonstrate a general route to functionalize exfoliated 2H-MoS2 with cysteine. Critically, MoS2 was found to be facilitating the oxidation of the thiol cysteine to the disulfide cystine during functionalization. The resulting cystine was physisorbed on MoS2 rather than coordinated as a thiol (cysteine) filling S-vacancies in the 2H-MoS2 surface, as originally conceived. These observations were found to be true for other organic thiols and indeed other TMDs. Our findings suggest that functionalization of two-dimensional MoS2 using organic thiols may not yield covalently or datively tethered functionalities, rather, in this instance, they yield physisorbed disulfides that are easily removed. PMID:27038093

  17. Experimental validation of the ``FLoating Island'' concept: realization of low on-resistance FLYMOS™ transistors

    NASA Astrophysics Data System (ADS)

    Alves, S.; Morancho, F.; Reynès, J.-M.; Margheritta, J.; Deram, I.; Isoird, K.

    2005-10-01

    The present 14volts automotive electrical system will soon become 42volts. For these future automotive applications, development of 80volts power MOSFETs exhibiting low on-resistance is desired. The “FLoating Island” MOSFET (FLIMOSFET) is one of the new candidates to break the silicon limit, which is the “specific on-resistance/breakdown voltage” trade-off limit of conventional power MOSFETs. In this paper, the “FLoating Island” concept has been implemented on silicon: new vertical N-channel FLIMOSFETs (FLYMOS™) dedicated to automotive applications (below 100volts) have been fabricated for the first time, using two steps epitaxy process. Experimental results show that the FLYMOS™ transistor exhibit a breakdown voltage of 73volts but also an improved specific on-resistance compared to conventional VDMOSFETs (33% reduction of the specific on-resistance for the same breakdown voltage). In other words, in terms of “specific on-resistance/breakdown voltage” trade-off, the FLYMOS™ transistor is one of the best MOS devices in low voltage applications. These measurements validate the “FLoating Island” concept and the efficiency of the original edge cell that is used in the FLYMOS™ technology.

  18. Vertical Silicon Nanowire Field Effect Transistors with Nanoscale Gate-All-Around

    NASA Astrophysics Data System (ADS)

    Guerfi, Youssouf; Larrieu, Guilhem

    2016-04-01

    Nanowires are considered building blocks for the ultimate scaling of MOS transistors, capable of pushing devices until the most extreme boundaries of miniaturization thanks to their physical and geometrical properties. In particular, nanowires' suitability for forming a gate-all-around (GAA) configuration confers to the device an optimum electrostatic control of the gate over the conduction channel and then a better immunity against the short channel effects (SCE). In this letter, a large-scale process of GAA vertical silicon nanowire (VNW) MOSFETs is presented. A top-down approach is adopted for the realization of VNWs with an optimum reproducibility followed by thin layer engineering at nanoscale. Good overall electrical performances were obtained, with excellent electrostatic behavior (a subthreshold slope (SS) of 95 mV/dec and a drain induced barrier lowering (DIBL) of 25 mV/V) for a 15-nm gate length. Finally, a first demonstration of dual integration of n-type and p-type VNW transistors for the realization of CMOS inverter is proposed.

  19. Vertical Silicon Nanowire Field Effect Transistors with Nanoscale Gate-All-Around.

    PubMed

    Guerfi, Youssouf; Larrieu, Guilhem

    2016-12-01

    Nanowires are considered building blocks for the ultimate scaling of MOS transistors, capable of pushing devices until the most extreme boundaries of miniaturization thanks to their physical and geometrical properties. In particular, nanowires' suitability for forming a gate-all-around (GAA) configuration confers to the device an optimum electrostatic control of the gate over the conduction channel and then a better immunity against the short channel effects (SCE). In this letter, a large-scale process of GAA vertical silicon nanowire (VNW) MOSFETs is presented. A top-down approach is adopted for the realization of VNWs with an optimum reproducibility followed by thin layer engineering at nanoscale. Good overall electrical performances were obtained, with excellent electrostatic behavior (a subthreshold slope (SS) of 95 mV/dec and a drain induced barrier lowering (DIBL) of 25 mV/V) for a 15-nm gate length. Finally, a first demonstration of dual integration of n-type and p-type VNW transistors for the realization of CMOS inverter is proposed. PMID:27094824

  20. Low-frequency noise in MoSe2 field effect transistors

    NASA Astrophysics Data System (ADS)

    Das, Suprem R.; Kwon, Jiseok; Prakash, Abhijith; Delker, Collin J.; Das, Saptarshi; Janes, David B.

    2015-02-01

    One of the important performance metrics of emerging nanoelectronic devices, including low dimensional Field Effect Transistors (FETs), is the magnitude of the low-frequency noise. Atomically thin 2D semiconductor channel materials such as MoX2 (X ≡ S, Se) have shown promising transistor characteristics such as ION/IOFF ratio exceeding 106 and low IOFF, making them attractive as channel materials for next generation nanoelectronic devices. However, MoS2 FETs demonstrated to date exhibit high noise levels under ambient conditions. In this letter, we report at least two orders of magnitude smaller values of Hooge parameter in a back-gated MoSe2 FET (10 atomic layers) with nickel S/D contacts and measured at atmospheric pressure and temperature. The channel dominated regime of noise was extracted from the total noise spectrum and is shown to follow a mobility fluctuation model with 1/f dependence. The low noise in MoSe2 FETs is comparable to other 1D nanoelectronic devices such as carbon nanotube FETs (CNT-FETs) and paves the way for use in future applications in precision sensing and communications.

  1. Inversion channel diamond metal-oxide-semiconductor field-effect transistor with normally off characteristics.

    PubMed

    Matsumoto, Tsubasa; Kato, Hiromitsu; Oyama, Kazuhiro; Makino, Toshiharu; Ogura, Masahiko; Takeuchi, Daisuke; Inokuma, Takao; Tokuda, Norio; Yamasaki, Satoshi

    2016-01-01

    We fabricated inversion channel diamond metal-oxide-semiconductor field-effect transistors (MOSFETs) with normally off characteristics. At present, Si MOSFETs and insulated gate bipolar transistors (IGBTs) with inversion channels are widely used because of their high controllability of electric power and high tolerance. Although a diamond semiconductor is considered to be a material with a strong potential for application in next-generation power devices, diamond MOSFETs with an inversion channel have not yet been reported. We precisely controlled the MOS interface for diamond by wet annealing and fabricated p-channel and planar-type MOSFETs with phosphorus-doped n-type body on diamond (111) substrate. The gate oxide of Al2O3 was deposited onto the n-type diamond body by atomic layer deposition at 300 °C. The drain current was controlled by the negative gate voltage, indicating that an inversion channel with a p-type character was formed at a high-quality n-type diamond body/Al2O3 interface. The maximum drain current density and the field-effect mobility of a diamond MOSFET with a gate electrode length of 5 μm were 1.6 mA/mm and 8.0 cm(2)/Vs, respectively, at room temperature. PMID:27545201

  2. Inversion channel diamond metal-oxide-semiconductor field-effect transistor with normally off characteristics

    PubMed Central

    Matsumoto, Tsubasa; Kato, Hiromitsu; Oyama, Kazuhiro; Makino, Toshiharu; Ogura, Masahiko; Takeuchi, Daisuke; Inokuma, Takao; Tokuda, Norio; Yamasaki, Satoshi

    2016-01-01

    We fabricated inversion channel diamond metal-oxide-semiconductor field-effect transistors (MOSFETs) with normally off characteristics. At present, Si MOSFETs and insulated gate bipolar transistors (IGBTs) with inversion channels are widely used because of their high controllability of electric power and high tolerance. Although a diamond semiconductor is considered to be a material with a strong potential for application in next-generation power devices, diamond MOSFETs with an inversion channel have not yet been reported. We precisely controlled the MOS interface for diamond by wet annealing and fabricated p-channel and planar-type MOSFETs with phosphorus-doped n-type body on diamond (111) substrate. The gate oxide of Al2O3 was deposited onto the n-type diamond body by atomic layer deposition at 300 °C. The drain current was controlled by the negative gate voltage, indicating that an inversion channel with a p-type character was formed at a high-quality n-type diamond body/Al2O3 interface. The maximum drain current density and the field-effect mobility of a diamond MOSFET with a gate electrode length of 5 μm were 1.6 mA/mm and 8.0 cm2/Vs, respectively, at room temperature. PMID:27545201

  3. BN / Graphene / BN RF Transistors

    NASA Astrophysics Data System (ADS)

    Wang, Han; Taychatanapat, Thiti; Hsu, Allen; Jarillo-Herrero, Pablo; Palacios, Tomas

    2011-03-01

    In this work we demonstrate the first BN/graphene/BN transistor for high frequency RF applications. This sandwich structure allows a significant improvement in the mobility of graphene, which reaches more than 18,000 cm2 /Vs at room temperature. Graphene field effect transistors (GFETs) have been fabricated with LDS = 800 nm and LG = 300 nm. The minimum conduction point of these devices is very close to zero, a result of the negligible substrate doping to the graphene. A current density in excess of 1 A/mm and DC transconductance above 200 mS/mm are achieved for both electron and hole conductions. RF characterization is performed for the first time on this device structure and initial results show a current-gain cut-off frequency fT = 10 GHz. These experimental results have been combined with simulations of the small-signal model to study the scaling potential of these GFETs for high frequency applications. The impact of the access resistances (Rs , Rd) , the capacitances (Cgs , Cgd , Cds) , and the transconductance (g m) on the frequency performance of the GFETs has also been studied. Finally, the fabricated devices have been compared to GFETs fabricated with Si O2 substrate and Al 2 O3 gate dielectrics. The improved performance obtained by the BN/graphene/BN structure is very promising to enable the next generation of high frequency RF electronics.

  4. Morphology engineering of monolayer MoS2 by adjusting chemical environment during growth

    NASA Astrophysics Data System (ADS)

    Cao, Yingjie; Luo, Xingfang; Yuan, Cailei; Han, Shuming; Yu, Ting; Yang, Yong; Li, Qinliang

    2015-11-01

    The precise control of the morphology of monolayer MoS2 is of particular importance for their potential applications and device performance. In this work, we present an experimental method to study the shape evolution of the chemical vapor deposition (CVD) grown MoS2 flakes. We observed that the morphology of monolayer MoS2 flakes transformed from truncated triangular shape to triangular shape by increasing the stoichiometric ratio of S:Mo, and consequently tailor the optical properties of MoS2 flakes. The results suggest the possibility to engineer the morphology of monolayer MoS2 by adjusting the chemical environment during growth.

  5. Programmable ion-sensitive transistor interfaces. I. Electrochemical gating

    NASA Astrophysics Data System (ADS)

    Jayant, Krishna; Auluck, Kshitij; Funke, Mary; Anwar, Sharlin; Phelps, Joshua B.; Gordon, Philip H.; Rajwade, Shantanu R.; Kan, Edwin C.

    2013-07-01

    Electrochemical gating is the process by which an electric field normal to the insulator electrolyte interface shifts the surface chemical equilibrium and further affects the charge in solution [Jiang and Stein, LangmuirLANGD50743-746310.1021/la9044682 26, 8161 (2010)]. The surface chemical reactivity and double-layer charging at the interface of electrolyte-oxide-semiconductor (EOS) capacitors is investigated. We find a strong pH-dependent hysteresis upon dc potential cycling. Varying salinity at a constant pH does not change the hysteretic window, implying that field-induced surface pH regulation is the dominant cause of hysteresis. We propose and investigate this mechanism in foundry-made floating-gate ion-sensitive field-effect transistors, which can serve as both an ionic sensor and an actuator. Termed the chemoreceptive neuron metal-oxide-semiconductor (CνMOS) transistor, it features independently driven control gates (CGs) and sensing gates (SGs) that are capacitively coupled to an extended floating gate (FG). The SG is exposed to fluid, the CG is independently driven, and the FG is capable of storing charge QFG of either polarity. Asymmetric capacitive coupling between the CG and SG to FG results in intrinsic amplification of the measured surface potential shifts and influences the FG charge injection mechanism. This modified SG surface condition was monitored through transient recordings of the output current, performed under alternate positive and negative CG pulses. Transient recordings revealed a hysteresis where the current was enhanced under negative pulsing and reduced after positive pulsing. This hysteresis effect is similar to that observed with EOS capacitors, suggesting a field-dependent surface charge regulation mechanism at play. At high CG biases, nonvolatile charge QFG tunneling into the FG occurs, which creates a larger field and tunes the pH response and the point of zero charge. This mechanism gives rise to surface programmability. In

  6. Programmable ion-sensitive transistor interfaces. I. Electrochemical gating.

    PubMed

    Jayant, Krishna; Auluck, Kshitij; Funke, Mary; Anwar, Sharlin; Phelps, Joshua B; Gordon, Philip H; Rajwade, Shantanu R; Kan, Edwin C

    2013-07-01

    Electrochemical gating is the process by which an electric field normal to the insulator electrolyte interface shifts the surface chemical equilibrium and further affects the charge in solution [Jiang and Stein, Langmuir 26, 8161 (2010)]. The surface chemical reactivity and double-layer charging at the interface of electrolyte-oxide-semiconductor (EOS) capacitors is investigated. We find a strong pH-dependent hysteresis upon dc potential cycling. Varying salinity at a constant pH does not change the hysteretic window, implying that field-induced surface pH regulation is the dominant cause of hysteresis. We propose and investigate this mechanism in foundry-made floating-gate ion-sensitive field-effect transistors, which can serve as both an ionic sensor and an actuator. Termed the chemoreceptive neuron metal-oxide-semiconductor (CνMOS) transistor, it features independently driven control gates (CGs) and sensing gates (SGs) that are capacitively coupled to an extended floating gate (FG). The SG is exposed to fluid, the CG is independently driven, and the FG is capable of storing charge Q(FG) of either polarity. Asymmetric capacitive coupling between the CG and SG to FG results in intrinsic amplification of the measured surface potential shifts and influences the FG charge injection mechanism. This modified SG surface condition was monitored through transient recordings of the output current, performed under alternate positive and negative CG pulses. Transient recordings revealed a hysteresis where the current was enhanced under negative pulsing and reduced after positive pulsing. This hysteresis effect is similar to that observed with EOS capacitors, suggesting a field-dependent surface charge regulation mechanism at play. At high CG biases, nonvolatile charge Q(FG) tunneling into the FG occurs, which creates a larger field and tunes the pH response and the point of zero charge. This mechanism gives rise to surface programmability. In this paper we describe the

  7. Layer-by-layer self-assembly of polyelectrolyte functionalized MoS2 nanosheets.

    PubMed

    Shen, Jianfeng; Pei, Yu; Dong, Pei; Ji, Jin; Cui, Zheng; Yuan, Junhua; Baines, Robert; Ajayan, Pulickel M; Ye, Mingxin

    2016-05-01

    Few-layered polyelectrolyte functionalized MoS2 nanosheets were obtained for the first time through in situ polymerization of MoS2 nanosheets with poly(acrylic acid) and poly(acrylamide), both of which demonstrated excellent dispersibility and stability in water. After designing and optimizing the components of this series of polyelectrolyte functionalized MoS2 nanosheets, by exploiting the electrostatic interactions present in the modified MoS2 nanosheets, we further created a series of layer-by-layer (LBL) self-assembling MoS2-based films. To this end, uniform MoS2 nanosheet-based LBL films were precisely deposited on substrates such as quartz, silicon, and ITO. The polyelectrolyte functionalized MoS2 nanosheet assembled LBL film-modified electrodes demonstrated enhanced electrocatalytic activity for H2O2. As such, they are conducive to efficient sensors and advanced biosensing systems. PMID:27102889

  8. Single step, bulk synthesis of engineered MoS2 quantum dots for multifunctional electrocatalysis

    NASA Astrophysics Data System (ADS)

    Tadi, Kiran Kumar; Palve, Anil M.; Pal, Shubhadeep; Sudeep, P. M.; Narayanan, Tharangattu N.

    2016-07-01

    Bi- or tri- functional catalysts based on atomic layers are receiving tremendous scientific attention due to their importance in various energy technologies. Recent studies on molybdenum disulphide (MoS2) nanosheets revealed that controlling the edge states and doping/modifying with suitable elements are highly important in tuning the catalytic activities of MoS2. Here we report a bulk, single step method to synthesize metal modified MoS2 quantum dots (QDs). Three elements, namely Fe, Mg and Li, are chosen to study the effects of dopants in the catalytic activities of MoS2. Fe and Mg are found to act like dopants in the MoS2 lattice forming respective doped MoS2 QDs, while Li formed an intercalated MoS2 QD. The efficacy and tunability of these luminescent doped QDs towards various electrocatalytic activities (hydrogen evolution reaction, oxygen evolution reaction and oxygen reduction action) are reported here.

  9. Single step, bulk synthesis of engineered MoS2 quantum dots for multifunctional electrocatalysis.

    PubMed

    Tadi, Kiran Kumar; Palve, Anil M; Pal, Shubhadeep; Sudeep, P M; Narayanan, Tharangattu N

    2016-07-01

    Bi- or tri- functional catalysts based on atomic layers are receiving tremendous scientific attention due to their importance in various energy technologies. Recent studies on molybdenum disulphide (MoS2) nanosheets revealed that controlling the edge states and doping/modifying with suitable elements are highly important in tuning the catalytic activities of MoS2. Here we report a bulk, single step method to synthesize metal modified MoS2 quantum dots (QDs). Three elements, namely Fe, Mg and Li, are chosen to study the effects of dopants in the catalytic activities of MoS2. Fe and Mg are found to act like dopants in the MoS2 lattice forming respective doped MoS2 QDs, while Li formed an intercalated MoS2 QD. The efficacy and tunability of these luminescent doped QDs towards various electrocatalytic activities (hydrogen evolution reaction, oxygen evolution reaction and oxygen reduction action) are reported here. PMID:27231837

  10. Plasma nanocoating of thiophene onto MoS2 nanotubes

    NASA Astrophysics Data System (ADS)

    Türkaslan, Banu Esencan; Dikmen, Sibel; Öksüz, Lütfi; Öksüz, Aysegul Uygun

    2015-12-01

    MoS2 nanotubes were coated with conductive polymer thiophene by atmospheric pressure radio-frequency (RF) glow discharge. MoS2 nanotubes were prepared by thermal decomposition of hexadecylamine (HDA) intercalated laminar MoS2 precursor on anodized aluminum oxide template and the thiophene was polymerized directly on surface of these nanotubes as in situ by plasma method. The effect of plasma power on PTh/MoS2 nanocomposite properties has been investigated by means of Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM and EDX), and X-ray diffraction spectroscopy (XRD). The presence of PTh bands in the FTIR spectra of PTh/MoS2 nanotube nanocomposites corresponding XRD results indicates that the polythiophene coating onto MoS2 nanotube. The chemical structure of PTh is not changed when the plasma power of discharge differ from 117 to 360 W. SEM images of nanocomposites show that when the discharge power is increased between 117 and 360 W the average diameter of PTh/MoS2 nanotube nanocomposites are changed and the structure become more uniformly.

  11. Structural Properties of Finite MoS2 Nanowires

    NASA Astrophysics Data System (ADS)

    Clark, Shaylyn; Salgado, Andres; Fernandez-Seivane, Lucas; Lopez-Lozano, Xochitl

    2015-03-01

    Molybdenum disulfide (MoS2) has been one of the most important catalysts used in refineries worldwide for hydrodesulfurization over the past century. In the last decade, and with the advent of nanotechnology, there has been a special interest in MoS2 nanostructures due to their high potential as novel nanocatalysts. The study of the properties of these systems is of fundamental interest for the experimental design of their catalytic activity and efficiency. In this work, we have performed ab initio density-functional calculations (DFT) to investigate the structural properties of finite MoS2 nanostrutures. All the models here presented were based on newly experimentally observed morphologies in MoS2 industrial catalysts using high-angle annular dark field scanning transmission electron microscopy (HAADF-STEM) images. We simulated STEM images of the theoretical models to compare it with the experimental ones. In contrast with infinite models, the finite models prefer a rippled/twisted structure morphology over the planar or helical ones. The rippled/twisted models appear to be structurally more stable.

  12. Thermal transport in MoS2/Graphene hybrid nanosheets.

    PubMed

    Zhang, Zhongwei; Xie, Yuee; Peng, Qing; Chen, Yuanping

    2015-09-18

    Heat dissipation is a very critical problem for designing nano-functional devices, including MoS2/graphene heterojunctions. In this paper we investigate thermal transport in MoS2/graphene hybrid nanosheets under various heating conditions, by using molecular dynamics simulation. Diverse transport processes and characteristics, depending on the conducting layers, are found in these structures. The thermal conductivities can be tuned by interlayer coupling, environment temperature, and interlayer overlap. The highest thermal conductivity at room temperature is achieved as more than 5 times of that of single-layer MoS2 when both layers are heated and 100% overlapped. Different transport mechanisms in the hybrid nanosheets are explained by phonon density of states, temperature distribution, and interlayer thermal resistance. Our results could not only provide clues to master the heat transport in functional devices based on MoS2/graphene heterojunctions, but are also useful for analyzing thermal transport in other van der Waals hybrid nanosheets. PMID:26313739

  13. Compliant substrate epitaxy: Au on MoS2

    NASA Astrophysics Data System (ADS)

    Zhou, Yuzhi; Kiriya, Daisuke; Haller, E. E.; Ager, Joel W.; Javey, Ali; Chrzan, D. C.

    2016-02-01

    A theory for the epitaxial growth of Au on MoS2 is developed and analyzed. The theory combines continuum linear elasticity theory with density functional theory to analyze epitaxial growth in this system. It is demonstrated that if one accounts for interfacial energies and strains, the presence of misfit dislocations, and the compliance of the MoS2 substrate, the experimentally observed growth orientation is favored despite the fact that it represents a larger elastic mismatch than two competing structures. The stability of the experimentally preferred orientation is attributed to the formation of a large number of strong Au-S bonds, and it is noted that this strong bond may serve as a means to exfoliate and transfer large single layers sheets of MoS2, as well as to engineer strain within single layers of MoS2. The potential for using a van der Waals-bonded layered material as a compliant substrate for applications in 2D electronic devices and epitaxial thin film growth is discussed.

  14. Pass-transistor very large scale integration

    NASA Technical Reports Server (NTRS)

    Maki, Gary K. (Inventor); Bhatia, Prakash R. (Inventor)

    2004-01-01

    Logic elements are provided that permit reductions in layout size and avoidance of hazards. Such logic elements may be included in libraries of logic cells. A logical function to be implemented by the logic element is decomposed about logical variables to identify factors corresponding to combinations of the logical variables and their complements. A pass transistor network is provided for implementing the pass network function in accordance with this decomposition. The pass transistor network includes ordered arrangements of pass transistors that correspond to the combinations of variables and complements resulting from the logical decomposition. The logic elements may act as selection circuits and be integrated with memory and buffer elements.

  15. Protonic transistors from thin reflecting films

    SciTech Connect

    Ordinario, David D.; Phan, Long; Jocson, Jonah-Micah; Nguyen, Tam; Gorodetsky, Alon A.

    2015-01-01

    Ionic transistors from organic and biological materials hold great promise for bioelectronics applications. Thus, much research effort has focused on optimizing the performance of these devices. Herein, we experimentally validate a straightforward strategy for enhancing the high to low current ratios of protein-based protonic transistors. Upon reducing the thickness of the transistors’ active layers, we increase their high to low current ratios 2-fold while leaving the other figures of merit unchanged. The measured ratio of 3.3 is comparable to the best values found for analogous devices. These findings underscore the importance of the active layer geometry for optimum protonic transistor functionality.

  16. Transistors using crystalline silicon devices on glass

    DOEpatents

    McCarthy, Anthony M.

    1995-01-01

    A method for fabricating transistors using single-crystal silicon devices on glass. This method overcomes the potential damage that may be caused to the device during high voltage bonding and employs a metal layer which may be incorporated as part of the transistor. This is accomplished such that when the bonding of the silicon wafer or substrate to the glass substrate is performed, the voltage and current pass through areas where transistors will not be fabricated. After removal of the silicon substrate, further metal may be deposited to form electrical contact or add functionality to the devices. By this method both single and gate-all-around devices may be formed.

  17. Nonvolatile Ferroelectric Memory Circuit Using Black Phosphorus Nanosheet-Based Field-Effect Transistors with P(VDF-TrFE) Polymer.

    PubMed

    Lee, Young Tack; Kwon, Hyeokjae; Kim, Jin Sung; Kim, Hong-Hee; Lee, Yun Jae; Lim, Jung Ah; Song, Yong-Won; Yi, Yeonjin; Choi, Won-Kook; Hwang, Do Kyung; Im, Seongil

    2015-10-27

    Two-dimensional van der Waals (2D vdWs) materials are a class of new materials that can provide important resources for future electronics and materials sciences due to their unique physical properties. Among 2D vdWs materials, black phosphorus (BP) has exhibited significant potential for use in electronic and optoelectronic applications because of its allotropic properties, high mobility, and direct and narrow band gap. Here, we demonstrate a few-layered BP-based nonvolatile memory transistor with a poly(vinylidenefluoride-trifluoroethylene) (P(VDF-TrFE)) ferroelectric top gate insulator. Experiments showed that our BP-based ferroelectric transistors operate satisfactorily at room temperature in ambient air and exhibit a clear memory window. Unlike conventional ambipolar BP transistors, our ferroelectric transistors showed only p-type characteristics due to the carbon-fluorine (C-F) dipole effect of the P(VDF-TrFE) layer, as well as the highest linear mobility value of 1159 cm(2) V(-1) s(-1) with a 10(3) on/off current ratio. For more advanced memory applications beyond unit memory devices, we implemented two memory inverter circuits, a resistive-load inverter circuit and a complementary inverter circuit, combined with an n-type molybdenum disulfide (MoS2) nanosheet. Our memory inverter circuits displayed a clear memory window of 15 V and memory output voltage efficiency of 95%. PMID:26370537

  18. Pressure confinement effect in MoS2 monolayers.

    PubMed

    Li, Fangfei; Yan, Yalan; Han, Bo; Li, Liang; Huang, Xiaoli; Yao, Mingguang; Gong, Yuanbo; Jin, Xilian; Liu, Baoli; Zhu, Chuanrui; Zhou, Qiang; Cui, Tian

    2015-05-21

    With ever increasing interest in layered materials, molybdenum disulfide has been widely investigated due to its unique optoelectronic properties. Pressure is an effective technique to tune the lattice and electronic structure of materials such that high pressure studies can disclose new structural and optical phenomena. In this study, taking MoS2 as an example, we investigate the pressure confinement effect on monolayer MoS2 by in situ high pressure Raman and photoluminescence (PL) measurements. Our results reveal a structural deformation of monolayer MoS2 starting from 0.84 GPa, which is evidenced by the splitting of E(1)2g and A1g modes. A further compression leads to a transition from the 1H-MoS2 phase to a novel structure evidenced by the appearance of two new peaks located at 200 and 240 cm(-1). This is a distinct feature of monolayer MoS2 compared with bulk MoS2. The new structure is supposed to have a distorted unit with the S atoms slided within a single layer like that of metastable 1T'-MoS2. However, unlike the non-photoluminescent 1T'-MoS2 structure, our monolayer shows a remarkable PL peak and a pressure-induced blue shift up to 13.1 GPa. This pressure-dependent behavior might enable the development of novel devices with multiple phenomena involving the strong coupling of the mechanical, electrical and optical properties of layered nanomaterials. PMID:25922917

  19. Dual role of monolayer MoS2 in enhanced photocatalytic performance of hybrid MoS2/SnO2 nanocomposite

    NASA Astrophysics Data System (ADS)

    Ding, Shuang-Shuang; Huang, Wei-Qing; Yang, Yin-Cai; Zhou, Bing-Xin; Hu, Wang-Yu; Long, Meng-Qiu; Peng, P.; Huang, Gui-Fang

    2016-05-01

    The enhanced photocatalytic performance of various MoS2-based nanomaterials has recently been observed, but the role of monolayer MoS2 is still not well elucidated at the electronic level. Herein, focusing on a model system, hybrid MoS2/SnO2 nanocomposite, we first present a theoretical elucidation of the dual role of monolayer MoS2 as a sensitizer and a co-catalyst by performing density functional theory calculations. It is demonstrated that a type-II, staggered, band alignment of ˜0.49 eV exists between monolayer MoS2 and SnO2 with the latter possessing the higher electron affinity, or work function, leading to the robust separation of photoexcited charge carriers between the two constituents. Under irradiation, the electrons are excited from Mo 4d orbitals to SnO2, thus enhancing the reduction activity of latter, indicating that the monolayer MoS2 is an effective sensitizer. Moreover, the Mo atoms, which are catalytically inert in isolated monolayer MoS2, turn into catalytic active sites, making the monolayer MoS2 to be a highly active co-catalyst in the composite. The dual role of monolayer MoS2 is expected to arise in other MoS2-semiconductor nanocomposites. The calculated absorption spectra can be rationalized by available experimental results. These findings provide theoretical evidence supporting the experimental reports and pave the way for developing highly efficient MoS2-based photocatalysts.

  20. Ultra-stable oscillator with complementary transistors

    NASA Technical Reports Server (NTRS)

    Kleinberg, L. L. (Inventor)

    1974-01-01

    A high frequency oscillator, having both good short and long term stability, is formed by including a piezoelectric crystal in the base circuit of a first bi-polar transistor circuit, the bi-polar transistor itself operated below its transitional frequency and having its emitter load chosen so that the input impedance, looking into the base thereof, exhibits a negative resistance in parallel with a capacitive reactance. Combined with this basic circuit is an auxiliary, complementary, second bi-polar transistor circuit of the same form with the piezoelectric crystal being common to both circuits. By this configuration small changes in quiescent current are substantially cancelled by opposite variations in the second bi-polar transistor circuit, thereby achieving from the oscillator a signal having its frequency of oscillation stable over long time periods as well as short time periods.

  1. Silicon Carbide Transistor For Detecting Hydrocarbon Gases

    NASA Technical Reports Server (NTRS)

    Shields, Virgil B.; Ryan, Margaret A.; Williams, Roger M.

    1996-01-01

    Proposed silicon carbide variable-potential insulated-gate field-effect transistor specially designed for use in measuring concentrations of hydrocarbon gases. Devices like this prove useful numerous automotive, industrial, aeronautical, and environmental monitoring applications.

  2. Spin gated transistors for reprogrammable logic

    NASA Astrophysics Data System (ADS)

    Ciccarelli, Chiara; Gonzalez-Zalba, Fernando; Irvine, Andrew; Campion, Richard; Zarbo, Liviu; Gallagher, Brian; Ferguson, Andrew; Jungwirth, Tomas; Wunderlich, Joerg; Institute of Physics ASCR Collaboration; University of Nottingham Collaboration; Hitachi Cambridge Laboratory Team; Institute of Physics ASCR Collaboration; University of Nottingham Collaboration; University of Cambridge Team

    2014-03-01

    In spin-orbit coupled magnetic materials the chemical potential depends on the orientation of the magnetisation. By making the gate of a field effect transistor magnetic, it is possible to tune the channel conductance not only electrically but also magnetically. We show that these magnetic transistor can be used to realise non-volatile reprogrammable Boolean logic. The non-volatile reconfigurable capability resides in the magnetization-dependent band structure of the magnetic stack. A change in magnetization orientation produces a change in the electrochemical potential, which induces a charge accumulation in the correspondent gate electrode. This is readily sensed by a field-effect device such as standard field-effect transistors or more exotic single-electron transistors. We propose circuits for low power consumption applications that can be magnetically switched between NAND and OR logic functions and between NOR and AND logic functions.

  3. Comparing the Ocean Color Measurements Between MOS and SeaWiFS: A Vicarious Intercalibration Approach for MOS

    NASA Technical Reports Server (NTRS)

    Wang, Menghua; Franz, Bryan A.

    1998-01-01

    One of the primary goals of the NASA Sensor Intercomparison and Merger for Biological and Interdisciplinary Oceanic Studies (SIMBIOS) project is to develop methods for meaningful comparison and possible merging of data products from multiple ocean color missions. The Modular Optoelectronic Scanner (MOS) is a German instrument that was launched in the spring of 1996 on the Indian IRS-P3 satellite. With the successful launch of NASA's Sea-viewing Wide Field-of-view Sensor (SeaWiFS) in the summer of 1997, there are now two ocean color missions in concurrent operation and there is interest within the scientific community to compare data from these two sensors. In this paper, we describe our efforts to retrieve ocean optical properties from both SeaWiFS and MOS using consistent methods. We first briefly review the atmospheric correction, which removes more than 90% of the observed radiances in the visible, and then describe how the atmospheric correction algorithm used for the SeaWiFS data can be modified for application to other ocean color sensors. Next, since the retrieved water-leaving radiances in the visible between MOS and SeaWiFS are significantly different, we developed a vicarious intercalibration method to recalibrate the MOS spectral bands based on the optical properties of the ocean and atmosphere derived from the coincident SeaWiFS measurements. We present and discuss the MOS retrieved ocean optical properties before and after the vicarious calibration, and demonstrate the efficacy of this approach. We show that it is possible and efficient to vicariously intercalibrate sensors between one and another.

  4. High-performance enhancement-mode AlGaN/GaN MOS-HEMTs with fluorinated stack gate dielectrics and thin barrier layer

    NASA Astrophysics Data System (ADS)

    Tao, Gao; Ruimin, Xu; Kai, Zhang; Yuechan, Kong; Jianjun, Zhou; Cen, Kong; Xinxin, Yu; Xun, Dong; Tangsheng, Chen

    2016-06-01

    We present high-performance enhancement-mode AlGaN/GaN metal—oxide—semiconductor high-electron mobility transistors (MOS-HEMTs) by a fluorinated gate dielectric technique. A nanolaminate of an Al2O3/La x Al1‑x O 3/Al2O3 stack (x≈0.33) grown by atomic layer deposition is employed to avoid fluorine ions implantation into the scaled barrier layer. Fabricated enhancement-mode MOS-HEMTs exhibit an excellent performance as compared to those with the conventional dielectric-last technique, delivering a large maximum drain current of 916 mA/mm and simultaneously a high peak transconductance of 342 mS/mm. The balanced DC characteristics indicate that advanced gate stack dielectrics combined with buffered fluorine ions implantation have a great potential for high speed GaN E/D-mode integrated circuit applications. Project supported by the National Natural Science Foundation of China (Nos. 61504125, 61474101, 61106130 61076120, 61505181), and the Natural Science Foundation of Jiangsu Province of China (Nos. BK20131072, BE2012007, BK2012516).

  5. Physical understanding of trends in current collapse with atomic layer deposited dielectrics in AlGaN/GaN MOS heterojunction FETs

    NASA Astrophysics Data System (ADS)

    Ramanan, Narayanan; Lee, Bongmook; Misra, Veena

    2016-03-01

    Many passivation dielectrics are pursued for suppressing current collapse due to trapping/detrapping of access-region surface traps in AlGaN/GaN based metal oxide semiconductor heterojuction field effect transistors (MOS-HFETs). The suppression of current collapse can potentially be achieved either by reducing the interaction of surface traps with the gate via surface leakage current reduction, or by eliminating surface traps that can interact with the gate. But, the latter is undesirable since a high density of surface donor traps is required to sustain a high 2D electron gas density at the AlGaN/GaN heterointerface and provide a low ON-resistance. This presents a practical trade-off wherein a passivation dielectric with the optimal surface trap characteristics and minimal surface leakage is to be chosen. In this work, we compare MOS-HFETs fabricated with popular ALD gate/passivation dielectrics like SiO2, Al2O3, HfO2 and HfAlO along with an additional thick plasma-enhanced chemical vapor deposition SiO2 passivation. It is found that after annealing in N2 at 700 °C, the stack containing ALD HfAlO provides a combination of low surface leakage and a high density of shallow donor traps. Physics-based TCAD simulations confirm that this combination of properties helps quick de-trapping and minimal current collapse along with a low ON resistance.

  6. Carbon nanotube electrodes in organic transistors.

    PubMed

    Valitova, Irina; Amato, Michele; Mahvash, Farzaneh; Cantele, Giovanni; Maffucci, Antonio; Santato, Clara; Martel, Richard; Cicoira, Fabio

    2013-06-01

    The scope of this Minireview is to provide an overview of the recent progress on carbon nanotube electrodes applied to organic thin film transistors. After an introduction on the general aspects of the charge injection processes at various electrode-semiconductor interfaces, we discuss the great potential of carbon nanotube electrodes for organic thin film transistors and the recent achievements in the field. PMID:23639944

  7. Shaping Transistor Leads for Better Solder Joints

    NASA Technical Reports Server (NTRS)

    Mandel, H.; Dillon, J. D.

    1982-01-01

    Special lead-forming tool puts step in leads of microwave power transistors without damaging braze joints that fasten leads to package. Stepped leads are soldered to circuit boards more reliably than straight leads, and stress on brazes is relieved. Lead-forming hand-tool has two parts: a forming die and an actuator. Spring-loaded saddle is adjusted so that when transistor package is placed on it, leads rest on forming rails.

  8. Refined Transistor Model For Simulation Of SEU

    NASA Technical Reports Server (NTRS)

    Zoutendyk, John A.; Benumof, Reuben

    1988-01-01

    Equivalent base resistance added. Theoretical study develops equations for parameters of Gummel-Poon model of bipolar junction transistor: includes saturation current, amplification factors, charging times, knee currents, capacitances, and resistances. Portion of study concerned with base region goes beyond Gummel-Poon analysis to provide more complete understanding of transistor behavior. Extended theory useful in simulation of single-event upset (SEU) caused in logic circuits by cosmic rays or other ionizing radiation.

  9. Properties of single-layer MoS2 film fabricated by combination of sputtering deposition and post deposition sulfurization annealing using (t-C4H9)2S2

    NASA Astrophysics Data System (ADS)

    Ishihara, Seiya; Hibino, Yusuke; Sawamoto, Naomi; Suda, Kohei; Ohashi, Takumi; Matsuura, Kentarou; Machida, Hideaki; Ishikawa, Masato; Sudoh, Hiroshi; Wakabayashi, Hitoshi; Ogura, Atsushi

    2016-06-01

    The fabrication of a high-quality single-layer MoS2 film was achieved at a sufficiently low temperature of 500 °C by the combination of sputtering deposition and post deposition sulfurization annealing. Fabrication only by sputtering produces unintentionally sulfur-deficient nonstoichiometric films with poor crystalline quality in nature, making it difficult to fabricate atomically thin sputtered MoS2 films, especially with a single layer. From the results of the sulfurization annealing, sulfur deficiencies in the film were fully complemented and the crystalline quality, especially in-plane symmetry, was dramatically improved. The quasi-layered structure of the sputtered-MoS2 film led to the success in achieving low-temperature sulfurization annealing. Moreover, the film had large area uniformity, accurate thickness controllability, a direct bandgap of 1.86 eV, and an extremely high visible transmittance of more than 97%. Therefore, we consider that the fabrication technique will contribute to realizing MoS2 display applications such as a low-power-consumption thin-film-transistor liquid crystal display.

  10. Enhanced two dimensional electron gas transport characteristics in Al{sub 2}O{sub 3}/AlInN/GaN metal-oxide-semiconductor high-electron-mobility transistors on Si substrate

    SciTech Connect

    Freedsman, J. J. Watanabe, A.; Urayama, Y.; Egawa, T.

    2015-09-07

    The authors report on Al{sub 2}O{sub 3}/Al{sub 0.85}In{sub 0.15}N/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistor (MOS-HEMT) on Si fabricated by using atomic layer deposited Al{sub 2}O{sub 3} as gate insulator and passivation layer. The MOS-HEMT with the gate length of 2 μm exhibits excellent direct-current (dc) characteristics with a drain current maximum of 1270 mA/mm at a gate bias of 3 V and an off-state breakdown voltage of 180 V for a gate-drain spacing of 4 μm. Also, the 1 μm-gate MOS-HEMT shows good radio-frequency (rf) response such as current gain and maximum oscillation cut-off frequencies of 10 and 34 GHz, respectively. The capacitance-voltage characteristics at 1 MHz revealed significant increase in two-dimensional electron gas (2DEG) density for the MOS-HEMT compared to conventional Schottky barrier HEMTs. Analyses using drain-source conductivity measurements showed improvements in 2DEG transport characteristics for the MOS-HEMT. The enhancements in dc and rf performances of the Al{sub 2}O{sub 3}/Al{sub 0.85}In{sub 0.15}N/GaN MOS-HEMT are attributed to the improvements in 2DEG characteristics.

  11. Effects of reliability screens of MOS charge trapping

    SciTech Connect

    Shanneyfelt, M.R.; Winokur, P.S.; Fleetwood, D.M.; Schwank, J.R.; Reber, R.A. Jr.

    1995-09-01

    The effects of pre-irradiation elevated-temperature bias stresses on the radiation hardness of field-oxide transistors have been investigated as a function of stress temperature, time, and bias. Both the stress temperature and time are found to have a significant impact on radiation-induced charge buildup in these transistors. Specifically, an increase in either the stress temperature or time causes a much larger negative shift (towards depletion) in the I-V characteristics of the n-channel field-oxide transistors. This increased shift in the transistor I-V characteristics with stress temperature and time suggests that the mechanisms responsible for the stress effects are thermally activated. An activation energy of {approximately}0.38 eV was measured. The stress bias was found to have no impact on radiation-induced charge buildup in these transistors. The observed stress temperature, time, and bias dependencies appears to be consistent with the diffusion of molecular hydrogen during a given stress period. These results have important implications for the development of hardness assurance test methods.

  12. Microstructure and tribological properties of MoS2+Zr composite coatings in high humidity environment

    NASA Astrophysics Data System (ADS)

    Ye, Man; Zhang, Guojun; Ba, Yunwei; Wang, Tao; Wang, Xin; Liu, Zhuanning

    2016-03-01

    MoS2+Zr composite coatings with different Zr contents and their pure MoS2 counterparts were deposited on silicon wafers and steel substrates by closed field unbalanced magnetron sputtering system. The microstructure, mechanical and tribological properties of as-prepared coatings were systematically investigated using a number of analytical techniques and the effect of different Zr contents on tribological behaviors in humidity conditions of these as-deposited composite coatings was discussed. It is clearly uncovered from the present results that the MoS2+Zr composite coatings were amorphous nature embedding some nanocrystallites. Doping of MoS2 coatings with Zr can remarkably improve the mechanical and tribological properties of pure MoS2 coating in high humidity (68% RH) environment, rendering the coefficient of friction (COF) decreases with increasing Zr content. Additionally, MoS2+Zr composite coatings exhibit much more stable and lower friction coefficients with increasing applied load. The lowest friction coefficient of as-deposited MoS2+Zr composite coating was about 0.04 with an applied load of 20 N (at 68% RH), where the friction coefficient of pure MoS2 coating was around 0.7. The improved tribological property of the MoS2+Zr composite coatings in high humidity environment was discussed in terms of the obtained lower friction coefficient, higher hardness and better adhesion of the composite coatings combined with inhibition of MoS2 oxidation.

  13. Enhanced second harmonic generation of MoS2 layers on a thin gold film.

    PubMed

    Zeng, Jianhua; Yuan, Maohui; Yuan, Weiguang; Dai, Qiaofeng; Fan, Haihua; Lan, Sheng; Tie, Shaolong

    2015-08-28

    The linear and nonlinear optical properties of thin MoS2 layers exfoliated on an Au/SiO2 substrate were investigated both numerically and experimentally. It was found that the MoS2 layers with different thicknesses exhibited different colors on the gold film. The reflection spectra of the MoS2 layers with different thicknesses were calculated by using the finite-difference time-domain technique and the corresponding chromaticity coordinates were derived. The electric field enhancement factors at both the fundamental light and the second harmonic were calculated and the enhancement factors for second harmonic generation (SHG) were estimated for the MoS2 layers with different thicknesses. Different from the MoS2 layers on a SiO2/Si substrate where the maximum SHG was observed in the single-layer MoS2, the maximum SHG was achieved in the 17 nm-thick MoS2 layer on the Au/SiO2 substrate. As compared with the MoS2 layers on the SiO2/Si substrate, a significant enhancement in SHG was found for the MoS2 layers on the Au/SiO2 substrate due to the strong localization of the electric field. More interestingly, it was demonstrated experimentally that optical data storage can be realized by modifying the SHG intensity of a MoS2 layer through thinning its thickness. PMID:26204257

  14. Hierarchical MoS2-rGO nanosheets with high MoS2 loading with enhanced electro-catalytic performance

    NASA Astrophysics Data System (ADS)

    Zhou, Jing; Xiao, Han; Zhou, Bowen; Huang, Feifan; Zhou, Shoubin; Xiao, Wei; Wang, Dihua

    2015-12-01

    Incorporation of high-loading redox-active materials with small amounts of graphene is a general protocol to achieve high-performance catalysts. Herein, hierarchical MoS2-reduced graphene oxide nanosheet (denoted as MoS2-rGO nanosheets) hybrids with a loading of MoS2 as high as 94 wt% are synthesized. The obtained hierarchical MoS2-rGO nanosheets simultaneously integrate the structural and compositional design rationales for high-efficiency and durable electrocatalysts based on high weight ratio of MoS2 in hybrid composite, highly stable/conducting rGO, well-dispersed two-dimensional ultrathin MoS2 nanosheets, more exposed edge sites and micro/nano hierarchical structure. When evaluated as electrocatalysts for hydrogen evolution and oxygen reduction reactions, the hierarchical MoS2-rGO nanosheets demonstrates enhanced activity and excellent stability, promising their applications in MoS2 based electrochemical, photo-catalytic and photo-elecrocatalytic cells.

  15. MOS correction of GCM- and RCM-simulated daily precipitation

    NASA Astrophysics Data System (ADS)

    Eden, Jonathan; Widmann, Martin; Wong, Geraldine; Maraun, Douglas; Vrac, Mathieu; Kent, Thomas

    2013-04-01

    Understanding long-term changes in daily precipitation characteristics, particularly those associated with extreme events, is an important component of climate change science and impact assessment. Estimates of such changes are required at local scales where impacts are most keenly felt. However, the limited spatial resolution of General Circulation Models (GCMs) makes direct estimates of future daily precipitation unrealistic. A popular downscaling approach is to use GCMs to drive high-resolution Regional Climate Models (RCMs). Whilst able to simulate precipitation characteristics at smaller scales, RCMs do not represent local variables and remain limited by systematic errors and biases. It is possible to apply statistical corrections, known as Model Output Statistics (MOS), to RCM-simulated precipitation. The simplest form of MOS (including bias correction) follows a 'distribution-wise' approach in which the statistical link is derived between long-term distributions of simulated and observed variables. However, more sophisticated MOS methods may be performed 'event-wise' using, for example, multiple linear regression to derive links between simulated and observed sequences of day-to-day weather. This approach requires a fitting period in which the simulated temporal evolution of large-scale weather states matches that of the real world and is thus limited to either reanalysis-driven RCMs or nudged GCM simulations. It is unclear to what extent MOS can be used to correct daily precipitation directly from GCMs, thus removing the computationally challenging RCM step from the downscaling process. Here, we present and cross-validate a stochastic, event-wise MOS method for both GCM- and RCM-simulated precipitation. A 'mixture' model, combining gamma and generalised Pareto distributions, is used to represent the complete (extreme and non-extreme) precipitation distribution. This is combined with a vector generalised linear model (VGLM) in order to estimate the

  16. Complementary transistor-transistor logic /CTTL/ - An approach to high-speed micropower logic.

    NASA Technical Reports Server (NTRS)

    Stehlin, R. A.; Niemann, G. W.

    1972-01-01

    Description of a new approach to micropower integrated circuits that is called complementary transistor-transistor logic (CTTL). This logic combines the inherent low standby power of a complementary inverter with the high speed of the TTL-type input. Results of monolithic fabricated circuits are presented. These circuits are shown to be equally adaptable to hybrid and discrete circuitry.

  17. Interface modification of MoS2/SiO2 leading to conversion of conduction type of MoS2

    NASA Astrophysics Data System (ADS)

    Lin, Yow-Jon; Su, Ting-Hong

    2016-11-01

    Few-layer MoS2 prepared by the chemical vapor deposition method is deposited on SiO2 samples with/without sulfide treatment in order to experimentally study the mechanism of conduction-type conversion in MoS2. The MoS2 thin film deposited on a SiO2 substrate with sulfide treatment shows n-type behavior, whereas the MoS2 thin film deposited on a SiO2 substrate without sulfide treatment exhibits p-type behavior. Experimental identification confirms that n-type conversion is due to a combined effect of the broken Sisbnd O bonds and the formation of Sisbnd S bonds at the SiO2 surface that results in the removal of oxygen dangling bonds and a change in the MoS2sbnd SiO2 interaction.

  18. Covalent Modification of MoS2 with Poly(N-vinylcarbazole) for Solid-State Broadband Optical Limiters.

    PubMed

    Cheng, Hongxia; Dong, Ningning; Bai, Ting; Song, Yi; Wang, Jun; Qin, Yuanhao; Zhang, Bin; Chen, Yu

    2016-03-18

    New soluble MoS2 nanosheets covalently functionalized with poly(N-vinylcarbazole) (MoS2-PVK) were in situ synthesized for the first time. In contrast to MoS2 and MoS2 /PVK blends, both the solution of MoS2 -PVK in DMF and MoS2-PVK/poly(methyl methacrylate) (PMMA) film show superior nonlinear optical and optical limiting responses. The MoS2-PVK/PMMA film shows the largest nonlinear coefficients (βeff) of about 917 cm GW(-1) at λ=532 nm (cf. 100.69 cm GW(-1) for MoS2/PMMA and 125.12 cm GW(-1) for MoS2/PVK/PMMA) and about 461 cm GW(-1) at λ=1064 nm (cf. -48.92 cm GW(-1) for MoS2/PMMA and 147.56 cm GW(-1) for MoS2/PVK/PMMA). A larger optical limiting effect, with thresholds of about 0.3 GW cm(-2) at λ=532 nm and about 0.5 GW cm(-2) at λ=1064 nm, was also achieved from the MoS2-PVK/PMMA film. These values are among the highest reported for MoS2-based nonlinear optical materials. These results show that covalent functionalization of MoS2 with polymers is an effective way to improve nonlinear optical responses for efficient optical limiting devices. PMID:26891470

  19. EDITORIAL: Reigniting innovation in the transistor Reigniting innovation in the transistor

    NASA Astrophysics Data System (ADS)

    Demming, Anna

    2012-09-01

    Today the transistor is integral to the electronic circuitry that wires our lives. When Bardeen and Brattain first observed an amplified signal by connecting electrodes to a germanium crystal they saw that their 'semiconductor triode' could prove a useful alternative to the more cumbersome vacuum tubes used at the time [1]. But it was perhaps William Schottky who recognized the extent of the transistor's potential. A basic transistor has three or more terminals and current across one pair of terminals can switch or amplify current through another pair. Bardeen, Brattain and Schottky were jointly awarded a Nobel Prize in 1956 'for their researches on semiconductors and their discovery of the transistor effect' [2]. Since then many new forms of the transistor have been developed and understanding of the underlying properties is constantly advancing. In this issue Chen and Shih and colleagues at Taiwan National University and Drexel University report a pyroelectrics transistor. They show how a novel optothermal gating mechanism can modulate the current, allowing a range of developments in nanoscale optoelectronics and wireless devices [3]. The explosion of interest in nanoscale devices in the 1990s inspired electronics researchers to look for new systems that can act as transistors, such as carbon nanotube [4] and silicon nanowire [5] transistors. Generally these transistors function by raising and lowering an energy barrier of kBT -1, but researchers in the US and Canada have demonstrated that the quantum interference between two electronic pathways through aromatic molecules can also modulate the current flow [6]. The device has advantages for further miniaturization where energy dissipation in conventional systems may eventually cause complications. Interest in transistor technology has also led to advances in fabrication techniques for achieving high production quantities, such as printing [7]. Researchers in Florida in the US demonstrated field effect transistor

  20. MoS2 Heterojunctions by Thickness Modulation.

    PubMed

    Tosun, Mahmut; Fu, Deyi; Desai, Sujay B; Ko, Changhyun; Kang, Jeong Seuk; Lien, Der-Hsien; Najmzadeh, Mohammad; Tongay, Sefaattin; Wu, Junqiao; Javey, Ali

    2015-01-01

    In this work, we report lateral heterojunction formation in as-exfoliated MoS2 flakes by thickness modulation. Kelvin probe force microscopy is used to map the surface potential at the monolayer-multilayer heterojunction, and consequently the conduction band offset is extracted. Scanning photocurrent microscopy is performed to investigate the spatial photocurrent response along the length of the device including the source and the drain contacts as well as the monolayer-multilayer junction. The peak photocurrent is measured at the monolayer-multilayer interface, which is attributed to the formation of a type-I heterojunction. The work presents experimental and theoretical understanding of the band alignment and photoresponse of thickness modulated MoS2 junctions with important implications for exploring novel optoelectronic devices. PMID:26121940

  1. Further study of inversion layer MOS solar cells

    NASA Technical Reports Server (NTRS)

    Ho, Fat Duen

    1987-01-01

    A group of inversion layer MOS solar cells has been fabricated. The highest value of open-circuit voltage obtained for the cells is 0.568V. One of the cells has produced a short-circuit current of 79.6 mA and an open-circuit voltage of 0.54V. It is estimated that the actual area AMO efficiency of this cell is 6.6 percent with an assumed value of 0.75 for its fill factor. Efforts made for fabricating an IL/MOS cell with reasonable efficiencies are reported. Future work for 4 sq cm IL cells and 25 sq cm IL cells is discussed.

  2. Unusual reactivity of MoS2 nanosheets.

    PubMed

    Mondal, Biswajit; Som, Anirban; Chakraborty, Indranath; Baksi, Ananya; Sarkar, Depanjan; Pradeep, Thalappil

    2016-05-21

    The reactivity of the 2D nanosheets of MoS2 with silver ions in solution, leading to their spontaneous morphological and chemical transformations, is reported. This unique reactivity of the nanoscale form of MoS2 was in stark contrast to its bulk counterpart. While the gradual morphological transformation involving several steps has been captured with an electron microscope, precise chemical identification of the species involved was achieved by electron spectroscopy and mass spectrometry. The energetics of the system investigated supports the observed chemical transformation. The reaction with mercury and gold ions shows similar and dissimilar reaction products, respectively and points to the stability of the metal-sulphur bond in determining the chemical compositions of the final products. PMID:27128579

  3. Electronic and elastic properties of MoS 2

    NASA Astrophysics Data System (ADS)

    Wei, Li; Jun-fang, Chen; Qinyu, He; Teng, Wang

    2010-05-01

    The electronic structures and elastic properties of molybdenum disulfide are studied using first-principles calculations. The energy band structure and density of state (DOS) of MoS 2 at 0 GPa are calculated. The band gap energy of MoS 2 versus the pressure 0-40 GPa is obtained. We find that the band gap energy decreases as the pressure increases. The geometry optimized structural parameters for lithium nitride under different pressures are listed. The parameters a, c, and E (the enthalpy) all decrease with increasing pressure. However, parameter B (the bulk modulus), S (the shear modulus) and Y (the Young’s modulus) increase with pressure. The normalized lattice constants and the elastic modulus as two functions of pressure from 0-40 GPa are obtained. All the calculated elastic constants Cij increase by different rates with increasing pressure.

  4. MoS2 Heterojunctions by Thickness Modulation

    PubMed Central

    Tosun, Mahmut; Fu, Deyi; Desai, Sujay B.; Ko, Changhyun; Seuk Kang, Jeong; Lien, Der-Hsien; Najmzadeh, Mohammad; Tongay, Sefaattin; Wu, Junqiao; Javey, Ali

    2015-01-01

    In this work, we report lateral heterojunction formation in as-exfoliated MoS2 flakes by thickness modulation. Kelvin probe force microscopy is used to map the surface potential at the monolayer-multilayer heterojunction, and consequently the conduction band offset is extracted. Scanning photocurrent microscopy is performed to investigate the spatial photocurrent response along the length of the device including the source and the drain contacts as well as the monolayer-multilayer junction. The peak photocurrent is measured at the monolayer-multilayer interface, which is attributed to the formation of a type-I heterojunction. The work presents experimental and theoretical understanding of the band alignment and photoresponse of thickness modulated MoS2 junctions with important implications for exploring novel optoelectronic devices. PMID:26121940

  5. MoS2 Heterojunctions by Thickness Modulation

    DOE PAGESBeta

    Tosun, Mahmut; Fu, Deyi; Desai, Sujay B.; Ko, Changhyun; Seuk Kang, Jeong; Lien, Der-Hsien; Najmzadeh, Mohammad; Tongay, Sefaattin; Wu, Junqiao; Javey, Ali

    2015-06-30

    In this work, we report lateral heterojunction formation in as-exfoliated MoS2 flakes by thickness modulation. Kelvin probe force microscopy is used to map the surface potential at the monolayer-multilayer heterojunction, and consequently the conduction band offset is extracted. Scanning photocurrent microscopy is performed to investigate the spatial photocurrent response along the length of the device including the source and the drain contacts as well as the monolayer-multilayer junction. The peak photocurrent is measured at the monolayer-multilayer interface, which is attributed to the formation of a type-I heterojunction. Finally, the work presents experimental and theoretical understanding of the band alignment andmore » photoresponse of thickness modulated MoS2 junctions with important implications for exploring novel optoelectronic devices.« less

  6. Analyses of Transistor Punchthrough Failures

    NASA Technical Reports Server (NTRS)

    Nicolas, David P.

    1999-01-01

    The failure of two transistors in the Altitude Switch Assembly for the Solid Rocket Booster followed by two additional failures a year later presented a challenge to failure analysts. These devices had successfully worked for many years on numerous missions. There was no history of failures with this type of device. Extensive checks of the test procedures gave no indication for a source of the cause. The devices were manufactured more than twenty years ago and failure information on this lot date code was not readily available. External visual exam, radiography, PEID, and leak testing were performed with nominal results Electrical testing indicated nearly identical base-emitter and base-collector characteristics (both forward and reverse) with a low resistance short emitter to collector. These characteristics are indicative of a classic failure mechanism called punchthrough. In failure analysis punchthrough refers to an condition where a relatively low voltage pulse causes the device to conduct very hard producing localized areas of thermal runaway or "hot spots". At one or more of these hot spots, the excessive currents melt the silicon. Heavily doped emitter material diffuses through the base region to the collector forming a diffusion pipe shorting the emitter to base to collector. Upon cooling, an alloy junction forms between the pipe and the base region. Generally, the hot spot (punch-through site) is under the bond and no surface artifact is visible. The devices were delidded and the internal structures were examined microscopically. The gold emitter lead was melted on one device, but others had anomalies in the metallization around the in-tact emitter bonds. The SEM examination confirmed some anomalies to be cosmetic defects while other anomalies were artifacts of the punchthrough site. Subsequent to these analyses, the contractor determined that some irregular testing procedures occurred at the time of the failures heretofore unreported. These testing

  7. Enhanced monolayer MoS2/InP heterostructure solar cells by graphene quantum dots

    NASA Astrophysics Data System (ADS)

    Wang, Peng; Lin, Shisheng; Ding, Guqiao; Li, Xiaoqiang; Wu, Zhiqian; Zhang, Shengjiao; Xu, Zhijuan; Xu, Sen; Lu, Yanghua; Xu, Wenli; Zheng, Zheyang

    2016-04-01

    We demonstrate significantly improved photovoltaic response of monolayer molybdenum disulfide (MoS2)/indium phosphide (InP) van der Waals heterostructure induced by graphene quantum dots (GQDs). Raman and photoluminescence measurements indicate that effective charge transfer takes place between GQDs and MoS2, which results in n-type doping of MoS2. The doping effect increases the barrier height at the MoS2/InP heterojunction, thus the averaged power conversion efficiency of MoS2/InP solar cells is improved from 2.1% to 4.1%. The light induced doping by GQD provides a feasible way for developing more efficient MoS2 based heterostructure solar cells.

  8. Photoluminescence of freestanding single- and few-layer MoS2

    NASA Astrophysics Data System (ADS)

    Scheuschner, Nils; Ochedowski, Oliver; Kaulitz, Anne-Marie; Gillen, Roland; Schleberger, Marika; Maultzsch, Janina

    2014-03-01

    We present a photoluminescence study of freestanding and Si/SiO2 supported single- and few-layer MoS2. The single-layer exciton peak (A) is only observed in freestanding MoS2. The photoluminescence of supported single-layer MoS2 instead originates from the A- (trion) peak as the MoS2 is n-type doped from the substrate. In bilayer MoS2, the van der Waals interaction with the substrate decreases the indirect band gap energy by up to ≈80 meV. Furthermore, the photoluminescence spectra of suspended MoS2 can be influenced by interference effects.

  9. Meiotic induction by Xenopus cyclin B is accelerated by coexpression with mosXe.

    PubMed Central

    Freeman, R S; Ballantyne, S M; Donoghue, D J

    1991-01-01

    We have investigated the relationship between Xenopus laevis c-mos (mosXe) and the cyclin B component of maturation-promoting factor. Microinjection of Xenopus oocytes with in vitro-synthesized RNAs encoding Xenopus cyclin B1 or cyclin B2 induces the progression of meiosis, characterized by germinal vesicle breakdown (GVBD). By preinjecting oocytes with a mosXe-specific antisense oligonucleotide, we show that GVBD induced by cyclin B does not require expression of the mosXe protein. GVBD induced by cyclin B proceeds significantly faster than GVBD induced by progesterone or MosXe. However, coinjection of RNAs encoding cyclin B1 or cyclin B2 with mosXe RNA results in a 2.5- to 3-fold acceleration in GVBD relative to that induced by cyclin B alone. This acceleration of GVBD does not correlate with changes in the level of cyclin B1 and cyclin B2 phosphorylation. Images PMID:1825350

  10. Synthesis and characterization of vertically standing MoS2 nanosheets

    PubMed Central

    Li, Han; Wu, Huaqiang; Yuan, Shuoguo; Qian, He

    2016-01-01

    Molybdenum disulfide (MoS2) has been attracting much attentions due to its excellent electrical and optical properties. We report here the synthesis of large-scale and uniform MoS2 nanosheets with vertically standing morphology using chemical vapor deposition method. TEM observations clearly reveal the growth mechanism of these vertical structures. It is suggested that the vertical structures are caused by the compression and extrusion between MoS2 islands. More importantly, the vertical morphology of two dimensional (2D) materials hold many promising potential applications. We demonstrate here the as-synthesized vertically standing MoS2 nanosheets could be used for hydrogen evolution reaction, where the exchange current density is about 70 times of bulk MoS2. The field emission performance of vertically standing MoS2 were also improved due to the abundantly exposed edges. PMID:26888690

  11. Synthesis and characterization of vertically standing MoS2 nanosheets.

    PubMed

    Li, Han; Wu, Huaqiang; Yuan, Shuoguo; Qian, He

    2016-01-01

    Molybdenum disulfide (MoS2) has been attracting much attentions due to its excellent electrical and optical properties. We report here the synthesis of large-scale and uniform MoS2 nanosheets with vertically standing morphology using chemical vapor deposition method. TEM observations clearly reveal the growth mechanism of these vertical structures. It is suggested that the vertical structures are caused by the compression and extrusion between MoS2 islands. More importantly, the vertical morphology of two dimensional (2D) materials hold many promising potential applications. We demonstrate here the as-synthesized vertically standing MoS2 nanosheets could be used for hydrogen evolution reaction, where the exchange current density is about 70 times of bulk MoS2. The field emission performance of vertically standing MoS2 were also improved due to the abundantly exposed edges. PMID:26888690

  12. Synthesis and characterization of vertically standing MoS2 nanosheets

    NASA Astrophysics Data System (ADS)

    Li, Han; Wu, Huaqiang; Yuan, Shuoguo; Qian, He

    2016-02-01

    Molybdenum disulfide (MoS2) has been attracting much attentions due to its excellent electrical and optical properties. We report here the synthesis of large-scale and uniform MoS2 nanosheets with vertically standing morphology using chemical vapor deposition method. TEM observations clearly reveal the growth mechanism of these vertical structures. It is suggested that the vertical structures are caused by the compression and extrusion between MoS2 islands. More importantly, the vertical morphology of two dimensional (2D) materials hold many promising potential applications. We demonstrate here the as-synthesized vertically standing MoS2 nanosheets could be used for hydrogen evolution reaction, where the exchange current density is about 70 times of bulk MoS2. The field emission performance of vertically standing MoS2 were also improved due to the abundantly exposed edges.

  13. Random and targeted transgene insertion in Caenorhabditis elegans using a modified Mos1 transposon.

    PubMed

    Frøkjær-Jensen, Christian; Davis, M Wayne; Sarov, Mihail; Taylor, Jon; Flibotte, Stephane; LaBella, Matthew; Pozniakovsky, Andrei; Moerman, Donald G; Jorgensen, Erik M

    2014-05-01

    We have generated a recombinant Mos1 transposon that can insert up to 45-kb transgenes into the Caenorhabditis elegans genome. The minimal Mos1 transposon (miniMos) is 550 bp long and inserts DNA into the genome at high frequency (~60% of injected animals). Genetic and antibiotic markers can be used for selection, and the transposon is active in C. elegans isolates and Caenorhabditis briggsae. We used the miniMos transposon to generate six universal Mos1-mediated single-copy insertion (mosSCI) landing sites that allow targeted transgene insertion with a single targeting vector into permissive expression sites on all autosomes. We also generated two collections of strains: a set of bright fluorescent insertions that are useful as dominant, genetic balancers and a set of lacO insertions to track genome position. PMID:24820376

  14. Bending response of single layer MoS2.

    PubMed

    Xiong, Si; Cao, Guoxin

    2016-03-11

    Using molecular mechanics (or dynamics) simulations, three different approaches, including the targeted molecular mechanics, four-point bending and nanotube methods, are employed to investigate the bending response of single layer MoS2 (SLMoS2), among which four-point bending is the most accurate approach to determine the bending stiffness according to the continuum theory. It is found that when the bending curvature radius is large enough (e.g. >4 nm), three approaches will give the same bending stiffness of SLMoS2 and the bending behavior is isotropic for SLMoS2, whereas the nanotube method with small tubes (e.g. <4 nm) cannot give the correct bending stiffness. Compared with the reported result from the MoS2 nanotube calculated by density functional theory, the revised Stillinger-Weber (SW) and reactive empirical bond-order (REBO) potentials can give the reasonable bending stiffness of SLMoS2 (8.7-13.4 eV) as well as the effective deformed conformation. In addition, since the Mo-S bond deformation of SLMoS2 under bending is similar to that under in-plane tension/compression, the continuum bending theory can quite accurately predict the bending stiffness of SLMoS2 if a reasonable thickness of SLMoS2 is given. For SLMoS2, the reasonable thickness should be larger than the distance between its two S atomic planes and lower than the distance between two Mo atomic planes of bulk MoS2 crystal, e.g. 0.375-0.445 nm. PMID:26861930

  15. Time-dependent MOS breakdown. [of Na contaminated capacitors

    NASA Technical Reports Server (NTRS)

    Li, S. P.; Bates, E. T.; Maserjian, J.

    1976-01-01

    A general model for time-dependent breakdown in metal-oxide-silicon (MOS) structures is developed and related to experimental measurements on samples deliberately contaminated with Na. A statistical method is used for measuring the breakdown probability as a function of log time and applied field. It is shown that three time regions of breakdown can be explained respectively in terms of silicon surface defects, ion emission from the metal interface, and lateral ion diffusion at the silicon interface.

  16. Physics and chemistry of MoS2 intercalation compounds

    NASA Technical Reports Server (NTRS)

    Woollam, J. A.; Somoano, R. B.

    1977-01-01

    An investigation is made of the physics and chemistry of MoS2 intercalation compounds. These compounds may be separated into two groups according to their stoichiometry, structure and superconducting properties. The first group consists of Na, Ca, and Sr intercalates, and the second group consists of K, Rb, and Cs intercalates. Particular attention is given to the structure of the electronic energy band and to the normal state and superconducting properties of these compounds.

  17. Unusual reactivity of MoS2 nanosheets

    NASA Astrophysics Data System (ADS)

    Mondal, Biswajit; Som, Anirban; Chakraborty, Indranath; Baksi, Ananya; Sarkar, Depanjan; Pradeep, Thalappil

    2016-05-01

    The reactivity of the 2D nanosheets of MoS2 with silver ions in solution, leading to their spontaneous morphological and chemical transformations, is reported. This unique reactivity of the nanoscale form of MoS2 was in stark contrast to its bulk counterpart. While the gradual morphological transformation involving several steps has been captured with an electron microscope, precise chemical identification of the species involved was achieved by electron spectroscopy and mass spectrometry. The energetics of the system investigated supports the observed chemical transformation. The reaction with mercury and gold ions shows similar and dissimilar reaction products, respectively and points to the stability of the metal-sulphur bond in determining the chemical compositions of the final products.The reactivity of the 2D nanosheets of MoS2 with silver ions in solution, leading to their spontaneous morphological and chemical transformations, is reported. This unique reactivity of the nanoscale form of MoS2 was in stark contrast to its bulk counterpart. While the gradual morphological transformation involving several steps has been captured with an electron microscope, precise chemical identification of the species involved was achieved by electron spectroscopy and mass spectrometry. The energetics of the system investigated supports the observed chemical transformation. The reaction with mercury and gold ions shows similar and dissimilar reaction products, respectively and points to the stability of the metal-sulphur bond in determining the chemical compositions of the final products. Electronic supplementary information (ESI) available. See DOI: 10.1039/c6nr00878j

  18. Bending response of single layer MoS2

    NASA Astrophysics Data System (ADS)

    Xiong, Si; Cao, Guoxin

    2016-03-01

    Using molecular mechanics (or dynamics) simulations, three different approaches, including the targeted molecular mechanics, four-point bending and nanotube methods, are employed to investigate the bending response of single layer MoS2 (SLMoS2), among which four-point bending is the most accurate approach to determine the bending stiffness according to the continuum theory. It is found that when the bending curvature radius is large enough (e.g. >4 nm), three approaches will give the same bending stiffness of SLMoS2 and the bending behavior is isotropic for SLMoS2, whereas the nanotube method with small tubes (e.g. <4 nm) cannot give the correct bending stiffness. Compared with the reported result from the MoS2 nanotube calculated by density functional theory, the revised Stillinger-Weber (SW) and reactive empirical bond-order (REBO) potentials can give the reasonable bending stiffness of SLMoS2 (8.7-13.4 eV) as well as the effective deformed conformation. In addition, since the Mo-S bond deformation of SLMoS2 under bending is similar to that under in-plane tension/compression, the continuum bending theory can quite accurately predict the bending stiffness of SLMoS2 if a reasonable thickness of SLMoS2 is given. For SLMoS2, the reasonable thickness should be larger than the distance between its two S atomic planes and lower than the distance between two Mo atomic planes of bulk MoS2 crystal, e.g. 0.375-0.445 nm.

  19. Radiation damage in MOS integrated circuits, Part 1

    NASA Technical Reports Server (NTRS)

    Danchenko, V.

    1971-01-01

    Complementary and p-channel MOS integrated circuits made by four commercial manufacturers were investigated for sensitivity to radiation environment. The circuits were irradiated with 1.5 MeV electrons. The results are given for electrons and for the Co-60 gamma radiation equivalent. The data are presented in terms of shifts in the threshold potentials and changes in transconductances and leakages. Gate biases of -10V, +10V and zero volts were applied to individual MOS units during irradiation. It was found that, in most of circuits of complementary MOS technologies, noticable changes due to radiation appear first as increased leakage in n-channel MOSFETs somewhat before a total integrated dose 10 to the 12th power electrons/sg cm is reached. The inability of p-channel MOSFETs to turn on sets in at about 10 to the 13th power electrons/sq cm. Of the circuits tested, an RCA A-series circuit was the most radiation resistant sample.

  20. Analytical approach to excitonic properties of MoS2

    NASA Astrophysics Data System (ADS)

    Berghäuser, Gunnar; Malic, Ermin

    2014-03-01

    We present an analytical investigation of the optical absorption spectrum of monolayer molybdenum-disulfide. Based on the density matrix formalism, our approach gives insights into the microscopic origin of excitonic transitions, their relative oscillator strength, and binding energy. We show analytical expressions for the carrier-light coupling element, which contains the optical selection rules and describes well the valley-selective polarization in MoS2. In agreement with experimental results, we find the formation of strongly bound electron-hole pairs due to the efficient Coulomb interaction. The absorption spectrum of MoS2 features two pronounced peaks corresponding to the A and B exciton. For MoS2 on a SiO2 substrate, these are characterized by binding energies of 455 meV and 465 meV, respectively. Our calculations reveal their relative oscillator strength and predict the appearance of further low-intensity excitonic transitions at higher energies. The presented approach is applicable to other transition metal dichalcogenides and can be extended to investigations of trion and biexcitonic effects.

  1. Modal damping estimates of MOS-1 solar array paddle

    NASA Astrophysics Data System (ADS)

    Fujimori, Yoshinori; Kato, Junichi; Toda, Susumu

    The modal damping coefficients of MOS-1 solar array paddle have been estimated, based on experimental results of the paddle substrate—a prime load carrying component of the paddle structure—and on theoretical extrapolation. The damping coefficient values of 1st, 2nd, 3rd and 4th substrate modes are 0.69% (14.5 Hz), 0.07% (49.7 Hz), 0.27% (61.2 Hz) and 0.07% (96.7 Hz) respectively. Also this substrate experiment reveals that the effect of the air vanishes at the level of 0.01 Torr and that the relative alignment of fibers in CFRP skin vs the lines of principal stresses in the deformed state is strongly correlated with the damping level. Zener theory of thermo-elasticity coupling model has been applied to derive the damping coefficients of the plate. Then the modal damping coefficients of MOS-1 solar array paddle whose resonances lie in the range of 0.2-2 Hz are estimated by making use of the fitted curves to the experimental data. Next, the estimate is improved by considering the additional contribution from the solar cells and adhesive. Supplementing the foregoing estimates, quantitative assessment on the damping effect due to interface friction somewhere in the structure is made leading to the final estimate that the modal damping coefficients of MOS-1 solar array paddle would not be lower than 0.003.

  2. Monolayer MoS2 self-switching diodes

    NASA Astrophysics Data System (ADS)

    Al-Dirini, Feras; Hossain, Faruque M.; Mohammed, Mahmood A.; Hossain, Md Sharafat; Nirmalathas, Ampalavanapillai; Skafidas, Efstratios

    2016-01-01

    This paper presents a new molybdenum disulphide (MoS2) nanodevice that acts as a two-terminal field-effect rectifier. The device is an atomically-thin two-dimensional self-switching diode (SSD) that can be realized within a single MoS2 monolayer with very minimal process steps. Quantum simulation results are presented confirming the device's operation as a diode and showing strong non-linear I-V characteristics. Interestingly, the device shows p-type behavior, in which conduction is dominated by holes as majority charge carriers and the flow of reverse current is enhanced, while the flow of forward current is suppressed, in contrast to monolayer graphene SSDs, which behave as n-type devices. The presence of a large bandgap in monolayer MoS2 results in strong control over the channel, showing complete channel pinch-off in forward conduction, which was confirmed with transmission pathways plots. The device exhibited large leakage tunnelling current through the insulating trenches, which may have been due to the lack of passivation; nevertheless, reverse current remained to be 6 times higher than forward current, showing strong rectification. The effect of p-type substitutional channel doping of sulphur with phosphorus was investigated and showed that it greatly enhances the performance of the device, increasing the reverse-to-forward current rectification ratio more than an order of magnitude, up to a value of 70.

  3. Ab initio study of MoS2 nanotube bundles

    NASA Astrophysics Data System (ADS)

    Verstraete, Matthieu; Charlier, Jean-Christophe

    2003-07-01

    Recently, the synthesis of a new phase of MoS2I1/3 stoichiometry was reported [M. Remskar, A. Mrzel, Z. Skraba, A. Jesih, M. Ceh, J. Demšar, P. Stadelmann, F. Lévy, and D. Mihailovic, Science 292, 479 (2001)]. Electron microscope images and diffraction data were interpreted to indicate bundles of sub-nanometer-diameter single-wall MoS2 nanotubes. After experimental characterization, the structure was attributed to an assembly of “armchair” nanotubes with interstitial iodine. Using first-principles total-energy calculations, bundles of MoS2 nanotubes with different topologies and stoichiometries are investigated. All of the systems are strongly metallic. Configurations with “zigzag” structures are found to be more stable energetically than the “armchair” ones, though all of the structures have similar stabilities. After relaxation, there remain several candidates which give a lattice parameter in relative agreement with experiment. Further, spin-polarized calculations indicate that a structure with armchair tubes iodine atoms in their center acquires a very large spontaneous magnetic moment of 12μB, while the other structures are nonmagnetic. Our ab initio calculations show that in most of the other structures, the tubes are very strongly bound together, and that the compounds should be considered as a crystal, rather than as a bundle of tubes in the habitual sense.

  4. Highly Stretchable MoS2 and Phosphorene Kirigami

    NASA Astrophysics Data System (ADS)

    Campbell, David; Hanakata, Paul; Park, Harold

    Several recent works have shown how nanomesh and kirigami patterning can be used to increase the ductility of monolayer graphene and thin film electrodes, suggesting that this approach should be useful for other 2D materials. We have studied the effects of kirigami patterning on the mechanical properties of MoS2 and phosphorene ``monolayers,'' using classical molecular dynamics simulations. We have explored several different kirigami structures, focusing on two simple non-dimensional parameters found to be relevant in our previous study of graphene. These parameters are related to the density of cuts and to the ratio of the overlapping cut length to the nanoribbon length. We found that these membranes, despite not having the single atomic layer planar structure of graphene, show a significantly enhanced ductility that can be understood in terms of the two geometric parameters. For instance, fracture strains of MoS2 kirigami can be enhanced by a factor of six relative to pristine MoS2 nanoribbons. Our findings suggest that the kirigami cuts are the key to changing the morphology of 2D membranes to allow out of plane deflection and to prevent early failure

  5. Magnetic field effects on superconductivity in alkali metal intercalates of MoS2

    NASA Technical Reports Server (NTRS)

    Woollam, J. A.; Flood, D. J.; Wagoner, D. E.; Somoano, R. B.; Rembaum, A.

    1972-01-01

    The effects of a magnetic field on the superconducting transition in MoS2 intercalated with potassium and sodium were studied. It was found that the potassium intercalated MoS2 has better properties in a magnetic field. In zero magnetic field the transition to superconductivity begins near 6.4 K. Diagrams of the basic circuitry for superconducting transition studies, and charts showing critical magnetic field versus critical temperature for the intercalated MoS2 are included.

  6. MoS2 nanolayers grown on carbon nanotubes: an advanced reinforcement for epoxy composites.

    PubMed

    Zhou, Keqing; Liu, Jiajia; Shi, Yongqian; Jiang, Saihua; Wang, Dong; Hu, Yuan; Gui, Zhou

    2015-03-25

    In the present study, carbon nanotubes (CNTs) wrapped with MoS2 nanolayers (MoS2-CNTs) were facilely synthesized to obtain advanced hybrids. The structure of the MoS2-CNT hybrids was characterized by X-ray diffraction, Raman spectroscopy, scanning electron microscopy, and transmission electron microscopy measurements. Subsequently, the MoS2-CNT hybrids were incorporated into EP for reducing fire hazards. Compared with pristine CNTs, MoS2-CNT hybrids showed good dispersion in EP matrix and no obvious aggregation of CNTs was observed. The obtained nanocomposites exhibited significant improvements in thermal properties, flame retardancy and mechanical properties, compared with those of neat EP and composites with a single CNT or MoS2. With the incorporation of 2.0 wt % of MoS2-CNT hybrids, the char residues and glass transition temperature (Tg) of the EP composite was significantly increased. Also, the addition of MoS2-CNT hybrids awarded excellent fire resistance to the EP matrix, which was evidenced by the significantly reduced peak heat release rate and total heat release. Moreover, the amount of organic volatiles from EP decomposition was obviously decreased, and the formation of toxic CO was effectively suppressed, implying the toxicity of the volatiles was reduced and smoke production was obviously suppressed. The dramatically reduced fire hazards were generally ascribed to the synergistic effect of MoS2 and CNTs, containing good dispersion of MoS2-CNT hybrids, catalytic char function of MoS2 nanolayers, and physical barrier effects of MoS2 nanolayers and CNT network structure. PMID:25742464

  7. Ambipolar phosphorene field effect transistor.

    PubMed

    Das, Saptarshi; Demarteau, Marcel; Roelofs, Andreas

    2014-11-25

    In this article, we demonstrate enhanced electron and hole transport in few-layer phosphorene field effect transistors (FETs) using titanium as the source/drain contact electrode and 20 nm SiO2 as the back gate dielectric. The field effect mobility values were extracted to be ∼38 cm(2)/Vs for electrons and ∼172 cm(2)/Vs for the holes. On the basis of our experimental data, we also comprehensively discuss how the contact resistances arising due to the Schottky barriers at the source and the drain end effect the different regime of the device characteristics and ultimately limit the ON state performance. We also propose and implement a novel technique for extracting the transport gap as well as the Schottky barrier height at the metal-phosphorene contact interface from the ambipolar transfer characteristics of the phosphorene FETs. This robust technique is applicable to any ultrathin body semiconductor which demonstrates symmetric ambipolar conduction. Finally, we demonstrate a high gain, high noise margin, chemical doping free, and fully complementary logic inverter based on ambipolar phosphorene FETs. PMID:25329532

  8. A correlated nickelate synaptic transistor

    NASA Astrophysics Data System (ADS)

    Shi, Jian; Ha, Sieu D.; Zhou, You; Schoofs, Frank; Ramanathan, Shriram

    2013-10-01

    Inspired by biological neural systems, neuromorphic devices may open up new computing paradigms to explore cognition, learning and limits of parallel computation. Here we report the demonstration of a synaptic transistor with SmNiO3, a correlated electron system with insulator-metal transition temperature at 130°C in bulk form. Non-volatile resistance and synaptic multilevel analogue states are demonstrated by control over composition in ionic liquid-gated devices on silicon platforms. The extent of the resistance modulation can be dramatically controlled by the film microstructure. By simulating the time difference between postneuron and preneuron spikes as the input parameter of a gate bias voltage pulse, synaptic spike-timing-dependent plasticity learning behaviour is realized. The extreme sensitivity of electrical properties to defects in correlated oxides may make them a particularly suitable class of materials to realize artificial biological circuits that can be operated at and above room temperature and seamlessly integrated into conventional electronic circuits.

  9. A correlated nickelate synaptic transistor.

    PubMed

    Shi, Jian; Ha, Sieu D; Zhou, You; Schoofs, Frank; Ramanathan, Shriram

    2013-01-01

    Inspired by biological neural systems, neuromorphic devices may open up new computing paradigms to explore cognition, learning and limits of parallel computation. Here we report the demonstration of a synaptic transistor with SmNiO₃, a correlated electron system with insulator-metal transition temperature at 130°C in bulk form. Non-volatile resistance and synaptic multilevel analogue states are demonstrated by control over composition in ionic liquid-gated devices on silicon platforms. The extent of the resistance modulation can be dramatically controlled by the film microstructure. By simulating the time difference between postneuron and preneuron spikes as the input parameter of a gate bias voltage pulse, synaptic spike-timing-dependent plasticity learning behaviour is realized. The extreme sensitivity of electrical properties to defects in correlated oxides may make them a particularly suitable class of materials to realize artificial biological circuits that can be operated at and above room temperature and seamlessly integrated into conventional electronic circuits. PMID:24177330

  10. Indium foil with beryllia washer improves transistor heat dissipation

    NASA Technical Reports Server (NTRS)

    Hilliard, J.; John, J. E. A.

    1964-01-01

    Indium foil, used as an interface material in transistor mountings, greatly reduces the thermal resistance of beryllia washers. This method improves the heat dissipation of power transistors in a vacuum environment.

  11. Sequential structural and optical evolution of MoS2 by chemical synthesis and exfoliation

    NASA Astrophysics Data System (ADS)

    Kim, Ju Hwan; Kim, Jungkil; Oh, Si Duck; Kim, Sung; Choi, Suk-Ho

    2015-06-01

    Various types of MoS2 structures are successfully obtained by using economical and facile sequential synthesis and exfoliation methods. Spherically-shaped lumps of multilayer (ML) MoS2 are prepared by using a conventional hydrothermal method and were subsequently 1st-exfoliated in hydrazine while being kept in autoclave to be unrolled and separated into five-to-six-layer MoS2 pieces of several-hundred nm in size. The MoS2 MLs are 2nd-exfoliated in sodium naphthalenide under an Ar ambient to finally produce bilayer MoS2 crystals of ~100 nm. The sequential exfoliation processes downsize MoS2 laterally and reduce its number of layers. The three types of MoS2 allotropes exhibit particular optical properties corresponding to their structural differences. These results suggest that two-dimensional MoS2 crystals can be prepared by employing only chemical techniques without starting from high-pressure-synthesized bulk MoS2 crystals.

  12. Density functional theory calculation of edge stresses in monolayer MoS2

    NASA Astrophysics Data System (ADS)

    Qi, Zenan; Cao, Penghui; Park, Harold S.

    2013-10-01

    We utilize density functional theory to calculate the edge energy and edge stress for monolayer MoS2 nanoribbons. In contrast to previous reports for graphene, for both armchair and zigzag chiralities, the edge stresses for MoS2 nanoribbons are found to be tensile, indicating that their lowest energy configuration is one of compression in which Mo-S bond lengths are shorter than those in a bulk, periodic MoS2 monolayer. The edge energy and edge stress is found to converge for both chiralities for nanoribbon widths larger than about 1 nm.

  13. Controlling the spontaneous emission rate of monolayer MoS2 in a photonic crystal nanocavity

    NASA Astrophysics Data System (ADS)

    Gan, Xuetao; Gao, Yuanda; Fai Mak, Kin; Yao, Xinwen; Shiue, Ren-Jye; van der Zande, Arend; Trusheim, Matthew E.; Hatami, Fariba; Heinz, Tony F.; Hone, James; Englund, Dirk

    2013-10-01

    We report on controlling the spontaneous emission (SE) rate of a molybdenum disulfide (MoS2) monolayer coupled with a planar photonic crystal (PPC) nanocavity. Spatially resolved photoluminescence (PL) mapping shows strong variations of emission when the MoS2 monolayer is on the PPC cavity, on the PPC lattice, on the air gap, and on the unpatterned gallium phosphide substrate. Polarization dependences of the cavity-coupled MoS2 emission show a more than 5 times stronger extracted PL intensity than the un-coupled emission, which indicates an underlying cavity mode Purcell enhancement of the MoS2 SE rate exceeding a factor of 70.

  14. Interfacial chemical reactions between MoS2 lubricants and bearing materials

    NASA Technical Reports Server (NTRS)

    Zabinski, J. S.; Tatarchuk, B. J.

    1989-01-01

    XPS and conversion-electron Moessbauer spectroscopy (CEMS) were used to examine iron that was deposited on the basal plane of MoS2 single crystals and subjected to vacuum annealing, oxidizing, and reducing environments. Iron either intercalated into the MoS2 structure or formed oriented iron sulfides, depending on the level of excess S in the MoS2 structure. CEMS data demonstrated that iron sulfide crystal structures preferentially aligned with respect to the MoS2 basal plane, and that alignment (and potentially adhesion) could be varied by appropriate high-temperature annealing procedures.

  15. MoS2 on an amorphous HfO2 surface: An ab initio investigation

    NASA Astrophysics Data System (ADS)

    Scopel, W. L.; Miwa, R. H.; Schmidt, T. M.; Venezuela, P.

    2015-05-01

    The energetic stability, electronic and structural properties of MoS2 adsorbed on an amorphous a-HfO2 surface (MoS2/HfO2) are examined through ab initio theoretical investigations. Our total energy results indicate that the formation of MoS2/HfO2 is an exothermic process with an adsorption energy of 34 meV/Å2, which means that it is more stable than similar systems like graphene/HfO2 and MoS2/SiO2. There are no chemical bonds at the MoS2-HfO2 interface. Upon formation of MoS2/HfO2, the electronic charge distribution is mostly localized at the interface region with no net charge transfer between the adsorbed MoS2 sheet and -HfO2 surface. However, the MoS2 sheet becomes n-type doped when there are oxygen vacancies in the HfO2 surface. Further investigation of the electronic distribution reveals that there are no electron- and hole-rich regions (electron-hole puddles) on the MoS2 sheet, which makes this system promising for use in high-speed nanoelectronic devices.

  16. Towards intrinsic phonon transport in single-layer MoS2

    NASA Astrophysics Data System (ADS)

    Peng, Bo; Zhang, Hao; Shao, Hezhu; Xu, Yuanfeng; Zhang, Xiangchao; Zhu, Heyuan

    2016-06-01

    The intrinsic lattice thermal conductivity of MoS$_2$ is an important aspect in the design of MoS$_2$-based nanoelectronic devices. We investigate the lattice dynamics properties of MoS$_2$ by first principles calculations. The intrinsic thermal conductivity of single-layer MoS$_2$ is calculated using the Boltzmann transport equation for phonons. The obtained thermal conductivity agrees well with the measurements. The contributions of acoustic and optical phonons to the lattice thermal conductivity are evaluated. The size dependence of thermal conductivity is investigated as well.

  17. High Accuracy Transistor Compact Model Calibrations

    SciTech Connect

    Hembree, Charles E.; Mar, Alan; Robertson, Perry J.

    2015-09-01

    Typically, transistors are modeled by the application of calibrated nominal and range models. These models consists of differing parameter values that describe the location and the upper and lower limits of a distribution of some transistor characteristic such as current capacity. Correspond- ingly, when using this approach, high degrees of accuracy of the transistor models are not expected since the set of models is a surrogate for a statistical description of the devices. The use of these types of models describes expected performances considering the extremes of process or transistor deviations. In contrast, circuits that have very stringent accuracy requirements require modeling techniques with higher accuracy. Since these accurate models have low error in transistor descriptions, these models can be used to describe part to part variations as well as an accurate description of a single circuit instance. Thus, models that meet these stipulations also enable the calculation of quantifi- cation of margins with respect to a functional threshold and uncertainties in these margins. Given this need, new model high accuracy calibration techniques for bipolar junction transis- tors have been developed and are described in this report.

  18. Polyphosphonium-based ion bipolar junction transistors

    PubMed Central

    Gabrielsson, Erik O.; Berggren, Magnus

    2014-01-01

    Advancements in the field of electronics during the past few decades have inspired the use of transistors in a diversity of research fields, including biology and medicine. However, signals in living organisms are not only carried by electrons but also through fluxes of ions and biomolecules. Thus, in order to implement the transistor functionality to control biological signals, devices that can modulate currents of ions and biomolecules, i.e., ionic transistors and diodes, are needed. One successful approach for modulation of ionic currents is to use oppositely charged ion-selective membranes to form so called ion bipolar junction transistors (IBJTs). Unfortunately, overall IBJT device performance has been hindered due to the typical low mobility of ions, large geometries of the ion bipolar junction materials, and the possibility of electric field enhanced (EFE) water dissociation in the junction. Here, we introduce a novel polyphosphonium-based anion-selective material into npn-type IBJTs. The new material does not show EFE water dissociation and therefore allows for a reduction of junction length down to 2 μm, which significantly improves the switching performance of the ion transistor to 2 s. The presented improvement in speed as well the simplified design will be useful for future development of advanced iontronic circuits employing IBJTs, for example, addressable drug-delivery devices. PMID:25553192

  19. Correlation between latent interface trap buildup and 1/{ital f} noise in metal{endash}oxide{endash}semiconductor transistors

    SciTech Connect

    Johnson, M.J.; Fleetwood, D.M.

    1997-03-01

    A long-term delayed increase in the 1/{ital f} noise of {ital p}-channel metal{endash}oxide{endash}semiconductor (MOS) transistors is observed in devices that show significant latent interface-trap buildup after exposure to ionizing radiation. During positive-bias postirradiation anneal, the noise increases by more than an order of magnitude above the level observed after irradiation. The increase in noise precedes the latent buildup of interface traps by at least 4.5 days during room-temperature annealing, and by {approximately}1 h during 100{degree}C annealing. The time and temperature dependencies of the increases in noise and interface trap buildup are consistent with the thermally activated motion of protons into the near-interfacial region of the oxide, followed by increases in border trap and interface trap densities. These results suggest hydrogen-related species can significantly affect the 1/{ital f} noise of MOS devices.{copyright} {ital 1997 American Institute of Physics.}

  20. Discrete transistor measuring and matching using a solid core oven

    NASA Astrophysics Data System (ADS)

    Inkinen, M.; Mäkelä, K.; Vuorela, T.; Palovuori, K.

    2013-03-01

    This paper presents transistor measurements done at a constant temperature. The aim in this research was to develop a reliable and repeatable method for measuring and searching transistor pairs with similar parameters, as in certain applications it is advantageous to use transistors from the same production batch due to the significant variability in batches from different manufacturers. Transistor manufacturing methods are well established, but due to the large variability in tolerance, not even transistors from the same manufacturing batch have identical properties. Transistors' electrical properties are also strongly temperature-dependent. Therefore, when measuring transistor properties, the temperature must be kept constant. For the measurement process, a solid-core oven providing stable temperature was implemented. In the oven, the base-to-emitter voltage (VBE) and DC-current gain (β) of 32 transistors could be measured simultaneously. The oven's temperature was controlled with a programmable thermostat, which allowed accurate constant temperature operation. The oven is formed by a large metal block with an individual chamber for each transistor to be measured. Isolation of individual transistors and the highly thermally conductive metal core structure prevent thermal coupling between transistors. The oven enables repeatable measurements, and thus measurements between different batches are comparable. In this research study, the properties of over 5000 transistors were measured and the variance of the aforementioned properties was analyzed.