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Sample records for 3n161 mos transistors

  1. Focused Ion Beam Induced Effects on MOS Transistor Parameters

    SciTech Connect

    Abramo, Marsha T.; Antoniou, Nicholas; Campbell, Ann N.; Fleetwood, Daniel M.; Hembree, Charles E.; Jessing, Jeffrey R.; Soden, Jerry M.; Swanson, Scot E.; Tangyunyong, Paiboon; Vanderlinde, William E.

    1999-07-28

    We report on recent studies of the effects of 50 keV focused ion beam (FIB) exposure on MOS transistors. We demonstrate that the changes in value of transistor parameters (such as threshold voltage, V{sub t}) are essentially the same for exposure to a Ga+ ion beam at 30 and 50 keV under the same exposure conditions. We characterize the effects of FIB exposure on test transistors fabricated in both 0.5 {micro}m and 0.225 {micro}m technologies from two different vendors. We report on the effectiveness of overlying metal layers in screening MOS transistors from FIB-induced damage and examine the importance of ion dose rate and the physical dimensions of the exposed area.

  2. Single-layer MoS2 transistors.

    PubMed

    Radisavljevic, B; Radenovic, A; Brivio, J; Giacometti, V; Kis, A

    2011-03-01

    Two-dimensional materials are attractive for use in next-generation nanoelectronic devices because, compared to one-dimensional materials, it is relatively easy to fabricate complex structures from them. The most widely studied two-dimensional material is graphene, both because of its rich physics and its high mobility. However, pristine graphene does not have a bandgap, a property that is essential for many applications, including transistors. Engineering a graphene bandgap increases fabrication complexity and either reduces mobilities to the level of strained silicon films or requires high voltages. Although single layers of MoS(2) have a large intrinsic bandgap of 1.8 eV (ref. 16), previously reported mobilities in the 0.5-3 cm(2) V(-1) s(-1) range are too low for practical devices. Here, we use a halfnium oxide gate dielectric to demonstrate a room-temperature single-layer MoS(2) mobility of at least 200 cm(2) V(-1) s(-1), similar to that of graphene nanoribbons, and demonstrate transistors with room-temperature current on/off ratios of 1 × 10(8) and ultralow standby power dissipation. Because monolayer MoS(2) has a direct bandgap, it can be used to construct interband tunnel FETs, which offer lower power consumption than classical transistors. Monolayer MoS(2) could also complement graphene in applications that require thin transparent semiconductors, such as optoelectronics and energy harvesting.

  3. Metal Oxide Silicon /MOS/ transistors protected from destructive damage by wire

    NASA Technical Reports Server (NTRS)

    Deboo, G. J.; Devine, E. J.

    1966-01-01

    Loop of flexible, small diameter, nickel wire protects metal oxide silicon /MOS/ transistors from a damaging electrostatic potential. The wire is attached to a music-wire spring, slipped over the MOS transistor case, and released so the spring tensions the wire loop around all the transistor leads, shorting them together. This allows handling without danger of damage.

  4. Double gate impact ionization MOS transistor: Proposal and investigation

    NASA Astrophysics Data System (ADS)

    Yang, Zhaonian; Zhang, Yue; Yang, Yuan; Yu, Ningmei

    2017-02-01

    In this paper, a double gate impact ionization MOS (DG-IMOS) transistor with improved performance is proposed and investigated by TCAD simulation. In the proposed design, a second gate is introduced in a conventional impact ionization MOS (IMOS) transistor that lengthens the equivalent channel length and suppresses the band-to-band tunneling. The OFF-state leakage current is reduced by over four orders of magnitude. At the ON-state, the second gate is negatively biased in order to enhance the electric field in the intrinsic region. As a result, the operating voltage does not increase with the increase in the channel length. The simulation result verifies that the proposed DG-IMOS achieves a better switching characteristic than the conventional is achieved. Lastly, the application of the DG-IMOS is discussed theoretically.

  5. Ambipolar MoS2 thin flake transistors.

    PubMed

    Zhang, Yijin; Ye, Jianting; Matsuhashi, Yusuke; Iwasa, Yoshihiro

    2012-03-14

    Field effect transistors (FETs) made of thin flake single crystals isolated from layered materials have attracted growing interest since the success of graphene. Here, we report the fabrication of an electric double layer transistor (EDLT, a FET gated by ionic liquids) using a thin flake of MoS(2), a member of the transition metal dichalcogenides, an archetypal layered material. The EDLT of the thin flake MoS(2) unambiguously displayed ambipolar operation, in contrast to its commonly known bulk property as an n-type semiconductor. High-performance transistor operation characterized by a large "ON" state conductivity in the order of ~mS and a high on/off ratio >10(2) was realized for both hole and electron transport. Hall effect measurements revealed mobility of 44 and 86 cm(2) V(-1) s(-1) for electron and hole, respectively. The hole mobility is twice the value of the electron mobility, and the density of accumulated carrier reached 1 × 10(14) cm(-2), which is 1 order of magnitude larger than conventional FETs with solid dielectrics. The high-density carriers of both holes and electrons can create metallic transport in the MoS(2) channel. The present result is not only important for device applications with new functionalities, but the method itself would also act as a protocol to study this class of material for a broader scope of possibilities in accessing their unexplored properties.

  6. Use of MOS structures for the investigation of low-dose-rate effects in bipolar transistors

    SciTech Connect

    Belyakov, V.V.; Pershenkov, V.S.; Shalnov, A.V.; Shvetzov-Shilovsky, I.N.

    1995-12-01

    A possible physical mechanism for bipolar transistor low-dose-rate irradiation response is discussed. This mechanism is described in terms of shallow electron traps in oxide. The experimental results on positive charge build-up at low dose-rates and small electric field in oxide are presented. The use of MOS transistor in bipolar mode for investigation of surface peripheral recombination current in bipolar transistor and extraction of MOS structure physical parameters is described.

  7. Ambipolar behavior in MoS2 field effect transistors by using catalytic oxidation

    NASA Astrophysics Data System (ADS)

    Choi, J. H.; Jang, H.-K.; Jin, J. E.; Shin, J. M.; Kim, D.-H.; Kim, G.-T.

    2016-10-01

    Modulation of electrical properties in MoS2 flakes is an attractive issue from the point of view of device applications. In this work, we demonstrate that an ambipolar behavior in MoS2 field effect transistors (FETs) can be easily obtained by heating MoS2 flakes under air atmosphere in the presence of cobalt oxide catalyst (MoS2 + O2 → MoOx + SOx). The catalytic oxidation of MoS2 flakes between source-drain electrodes resulted in lots of MoOx nanoparticles (NPs) on MoS2 flakes with thickness reduction from 64 nm to 17 nm. Consequently, N-type behavior of MoS2 FETs was converted into ambipolar transport characteristics by MoOx NPs which inject hole carriers to MoS2 flakes.

  8. Thickness-dependent electron mobility of single and few-layer MoS2 thin-film transistors

    NASA Astrophysics Data System (ADS)

    Kim, Ji Heon; Kim, Tae Ho; Lee, Hyunjea; Park, Young Ran; Choi, Woong; Lee, Cheol Jin

    2016-06-01

    We investigated the dependence of electron mobility on the thickness of MoS2 nanosheets by fabricating bottom-gate single and few-layer MoS2 thin-film transistors with SiO2 gate dielectrics and Au electrodes. All the fabricated MoS2 transistors showed on/off-current ratio of ˜107 and saturated output characteristics without high-k capping layers. As the MoS2 thickness increased from 1 to 6 layers, the field-effect mobility of the fabricated MoS2 transistors increased from ˜10 to ˜18 cm2V-1s-1. The increased subthreshold swing of the fabricated transistors with MoS2 thickness suggests that the increase of MoS2 mobility with thickness may be related to the dependence of the contact resistance and the dielectric constant of MoS2 layer on its thickness.

  9. Electrical Performance of Monolayer MoS2 Field-Effect Transistors Prepared by Chemical Vapor Deposition

    DTIC Science & Technology

    2013-05-16

    REPORT Electrical performance of monolayer MoS2 field-effect transistors prepared by chemical vapor deposition 14. ABSTRACT 16. SECURITY CLASSIFICATION...OF: Molybdenum disulfide ( MoS2 ) field effect transistors (FET) were fabricated on atomically smooth large-area single layers grown by chemical vapor...Standard Form 298 (Rev 8/98) Prescribed by ANSI Std. Z39.18 - Electrical performance of monolayer MoS2 field-effect transistors prepared by chemical

  10. Two different device physics principles for operating MoS2 transistor biosensors with femtomolar-level detection limits

    NASA Astrophysics Data System (ADS)

    Nam, Hongsuk; Oh, Bo-Ram; Chen, Pengyu; Yoon, Jeong Seop; Wi, Sungjin; Chen, Mikai; Kurabayashi, Katsuo; Liang, Xiaogan

    2015-07-01

    We experimentally identify two different physics principles for operating MoS2 transistor biosensors, which depend on antibody functionalization locations. If antibodies are functionalized on an insulating layer coated on a MoS2 transistor, antibody-antigen binding events mainly modify the transistor threshold voltage, which can be explained by the conventional capacitor model. If antibodies are directly grafted on the MoS2 transistor channel, the binding events mainly modulate the ON-state transconductance of the transistor, which is attributed to the antigen-induced disordered potential in the MoS2 channel. This work advances the device physics for simplifying the transistor biosensor structures targeting for femtomolar-level quantification of biomolecules.

  11. Nature of Electronic States in Ultrathin MoS2 Field Effect Transistor

    NASA Astrophysics Data System (ADS)

    Ghatak, Subhamoy; Nath Pal, Atindra; Ghosh, Arindam

    2012-02-01

    Molybdenum disulphide (MoS2) is a layered transition metal dichalcogenide with a Mo layer sandwiched between two S layers (S-Mo-S), which forms its basic unit. Each basic unit is attached to other units only with weak Van der Waals force. This enables to make an atomically thin single layer of MoS2 with a bandgap 1.9 eV. The presence of bandgap has made it an interesting material in thin film transistors. It has been reported [1] recently that very high on/off ratio (˜10^8) can be obtained in single layer MoS2 transistor due to the presence of this bandgap. Though the on/off ration is very high, mobility in these transistors are considerably low. Here we have investigated the origin of such low mobility. From our temperature dependent study we find that atomically thin MoS2 layer becomes highly disordered in the presence of the substrate and electron got localised in the traps created by the charge impurities at substrate-MoS2 interface. We propose that high mobility can be obtained in these transistors by removing the charge impurity background. [4pt] [1] Radisavljevic, B. et al. Nature Nanotechnology 2011, 6, 147--150. [0pt] [2] Ghatak, S. et al. ACS Nano 2011, 5, 7707.

  12. High performance MoS2-based field-effect transistor enabled by hydrazine doping

    NASA Astrophysics Data System (ADS)

    Lim, Dongsuk; Kannan, E. S.; Lee, Inyeal; Rathi, Servin; Li, Lijun; Lee, Yoontae; Atif Khan, Muhammad; Kang, Moonshik; Park, Jinwoo; Kim, Gil-Ho

    2016-06-01

    We investigated the n-type doping effect of hydrazine on the electrical characteristics of a molybdenum disulphide (MoS2)-based field-effect transistor (FET). The threshold voltage of the MoS2 FET shifted towards more negative values (from -20 to -70 V) on treating with 100% hydrazine solution with the channel current increasing from 0.5 to 25 μA at zero gate bias. The inverse subthreshold slope decreased sharply on doping, while the ON/OFF ratio increased by a factor of 100. Gate-channel coupling improved with doping, which facilitates the reduction of channel length between the source and drain electrodes without compromising on the transistor performance, making the MoS2-based FET easily scalable.

  13. Ionic-Liquid Gated Bilayer MoS2 Field-Effect Transistors

    NASA Astrophysics Data System (ADS)

    Madusanka Perera, Meeghage; Chuang, Hsun-Jen; Lin, Ming-Wei; Chamlagain, Bhim; Tan, Xuebin; Ming-Cheng Cheng, Mark; Zhou, Zhixian

    2012-10-01

    We report the electrical characterization of ionic-liquid-gated bilayer MoS2 field-effect transistors. An On-Off current ratio greater than 10^6 is achieved for hole transport, while that for electron transport exceeds 10^8. The subthreshold swing of our bilayer MoS2 devices reaches as low as 47 mV/dec at 230 K, approaching the theoretical limit. We also demonstrate that 1) the extrinsic mobility of back-gated MoS2 field-effect transistors is largely limited by the contact resistance; and 2) the extremely large electrical-double-layer capacitance of ionic liquid significantly reduces the Schottky contact barrier leading up to three orders of magnitude mobility increase for electron transport.

  14. The intrinsic origin of hysteresis in MoS2 field effect transistors

    NASA Astrophysics Data System (ADS)

    Shu, Jiapei; Wu, Gongtao; Guo, Yao; Liu, Bo; Wei, Xianlong; Chen, Qing

    2016-01-01

    We investigate the hysteresis and gate voltage stress effect in MoS2 field effect transistors (FETs). We observe that both the suspended and the SiO2-supported FETs have large hysteresis in their transfer curves under vacuum which cannot be attributed to the traps at the interface between the MoS2 and the SiO2 or in the SiO2 substrate or the gas adsorption/desorption effect. Our findings indicate that the hysteresis we observe comes from the MoS2 itself, revealing an intrinsic origin of the hysteresis besides some extrinsic factors. The fact that the FETs based on thinner MoS2 have larger hysteresis than that with thicker MoS2 suggests that the surface of MoS2 plays a key role in the hysteresis. The gate voltage sweep range, sweep direction, sweep time and loading history all affect the hysteresis observed in the transfer curves.We investigate the hysteresis and gate voltage stress effect in MoS2 field effect transistors (FETs). We observe that both the suspended and the SiO2-supported FETs have large hysteresis in their transfer curves under vacuum which cannot be attributed to the traps at the interface between the MoS2 and the SiO2 or in the SiO2 substrate or the gas adsorption/desorption effect. Our findings indicate that the hysteresis we observe comes from the MoS2 itself, revealing an intrinsic origin of the hysteresis besides some extrinsic factors. The fact that the FETs based on thinner MoS2 have larger hysteresis than that with thicker MoS2 suggests that the surface of MoS2 plays a key role in the hysteresis. The gate voltage sweep range, sweep direction, sweep time and loading history all affect the hysteresis observed in the transfer curves. Electronic supplementary information (ESI) available. See DOI: 10.1039/c5nr07336g

  15. Synthesized multiwall MoS2 nanotube and nanoribbon field-effect transistors

    NASA Astrophysics Data System (ADS)

    Fathipour, S.; Remskar, M.; Varlec, A.; Ajoy, A.; Yan, R.; Vishwanath, S.; Rouvimov, S.; Hwang, W. S.; Xing, H. G.; Jena, D.; Seabaugh, A.

    2015-01-01

    We report on the fabrication and characterization of synthesized multiwall MoS2 nanotube (NT) and nanoribbon (NR) field-effect transistors (FETs). The MoS2 NTs and NRs were grown by chemical transport, using iodine as a transport agent. Raman spectroscopy confirms the material as unambiguously MoS2 in NT, NR, and flake forms. Transmission electron microscopy was used to observe cross sections of the devices after electrical measurements and these were used in the interpretation of the electrical measurements, allowing the estimation of the current density. The NT and NR FETs demonstrate n-type behavior, with ON/OFF current ratios exceeding 103, and with current densities of 1.02 μA/μm and 0.79 μA/μm at VDS = 0.3 V and VBG = 1 V, respectively. Photocurrent measurements conducted on a MoS2 NT FET revealed short-circuit photocurrent of tens of nanoamps under an excitation optical power of 78 μW and 488 nm wavelength, which corresponds to a responsivity of 460 μA/W. A long channel transistor model was used to model the common-source characteristics of MoS2 NT and NR FETs and was shown to be consistent with the measured data.

  16. High Performance Chemical Sensing Using Schottky-Contacted CVD Grown Monolayer MoS2 Transistors

    NASA Astrophysics Data System (ADS)

    Chen, Liang; Liu, Bilu; Zhou, Chongwu; USC nanolab Team

    2014-03-01

    Recently emerged two-dimensional (2D) crystals offer unique advantages as potential sensing materials with high sensitivity, owing to their very high surface-to-bulk atom ratios and semiconducting properties. Here, we report the first use of chemical vapor deposition grown monolayer MoS2 as high performance chemical sensors with Schottky contacts. The Schottky-contacted MoS2 transistors show current changes by two to three orders of magnitude upon exposure to NO2 and NH3. The MoS2 sensors show clear detection of NO2 down to 20 ppb and NH3 down to 1 ppm, both of which are the best among various monolayer or few-layer MoS2 and other 2D transition metal dichalcogenides materials based chemical sensors reported so far. We attribute the observed high performance to both well known charger transfer mechanism and more importantly, the Schottky barrier modulation upon analyte molecules adsorption, the latter of which is made possible by the Schottky contacts in our transistors and is not identified previously for MoS2 sensors. This study may open up new ways for 2D semiconductors as sensors and also may benefit the fundamental studies of interfacial phenomena and interactions between various chemical species and monolayer semiconductors.

  17. Fabrication and electrical properties of MoS2 nanodisc-based back-gated field effect transistors

    PubMed Central

    2014-01-01

    Two-dimensional (2D) molybdenum disulfide (MoS2) is an attractive alternative semiconductor material for next-generation low-power nanoelectronic applications, due to its special structure and large bandgap. Here, we report the fabrication of large-area MoS2 nanodiscs and their incorporation into back-gated field effect transistors (FETs) whose electrical properties we characterize. The MoS2 nanodiscs, fabricated via chemical vapor deposition (CVD), are homogeneous and continuous, and their thickness of around 5 nm is equal to a few layers of MoS2. In addition, we find that the MoS2 nanodisc-based back-gated field effect transistors with nickel electrodes achieve very high performance. The transistors exhibit an on/off current ratio of up to 1.9 × 105, and a maximum transconductance of up to 27 μS (5.4 μS/μm). Moreover, their mobility is as high as 368 cm2/Vs. Furthermore, the transistors have good output characteristics and can be easily modulated by the back gate. The electrical properties of the MoS2 nanodisc transistors are better than or comparable to those values extracted from single and multilayer MoS2 FETs. PMID:24576344

  18. The intrinsic origin of hysteresis in MoS2 field effect transistors.

    PubMed

    Shu, Jiapei; Wu, Gongtao; Guo, Yao; Liu, Bo; Wei, Xianlong; Chen, Qing

    2016-02-07

    We investigate the hysteresis and gate voltage stress effect in MoS2 field effect transistors (FETs). We observe that both the suspended and the SiO2-supported FETs have large hysteresis in their transfer curves under vacuum which cannot be attributed to the traps at the interface between the MoS2 and the SiO2 or in the SiO2 substrate or the gas adsorption/desorption effect. Our findings indicate that the hysteresis we observe comes from the MoS2 itself, revealing an intrinsic origin of the hysteresis besides some extrinsic factors. The fact that the FETs based on thinner MoS2 have larger hysteresis than that with thicker MoS2 suggests that the surface of MoS2 plays a key role in the hysteresis. The gate voltage sweep range, sweep direction, sweep time and loading history all affect the hysteresis observed in the transfer curves.

  19. Vacuum ultraviolet radiation effects on two-dimensional MoS2 field-effect transistors

    NASA Astrophysics Data System (ADS)

    McMorrow, Julian J.; Cress, Cory D.; Arnold, Heather N.; Sangwan, Vinod K.; Jariwala, Deep; Schmucker, Scott W.; Marks, Tobin J.; Hersam, Mark C.

    2017-02-01

    Atomically thin MoS2 has generated intense interest for emerging electronics applications. Its two-dimensional nature and potential for low-power electronics are particularly appealing for space-bound electronics, motivating the need for a fundamental understanding of MoS2 electronic device response to the space radiation environment. In this letter, we quantify the response of MoS2 field-effect transistors (FETs) to vacuum ultraviolet (VUV) total ionizing dose radiation. Single-layer (SL) and multilayer (ML) MoS2 FETs are compared to identify differences that arise from thickness and band structure variations. The measured evolution of the FET transport properties is leveraged to identify the nature of VUV-induced trapped charge, isolating the effects of the interface and bulk oxide dielectric. In both the SL and ML cases, oxide trapped holes compete with interface trapped electrons, exhibiting an overall shift toward negative gate bias. Raman spectroscopy shows no variation in the MoS2 signatures as a result of VUV exposure, eliminating significant crystalline damage or oxidation as possible radiation degradation mechanisms. Overall, this work presents avenues for achieving radiation-hard MoS2 devices through dielectric engineering that reduces oxide and interface trapped charge.

  20. Molecular doping of MoS2 transistors by self-assembled oleylamine networks

    NASA Astrophysics Data System (ADS)

    Lockhart de la Rosa, César J.; Phillipson, Roald; Teyssandier, Joan; Adisoejoso, Jinne; Balaji, Yashwanth; Huyghebaert, Cedric; Radu, Iuliana; Heyns, Marc; De Feyter, Steven; De Gendt, Stefan

    2016-12-01

    Thin MoS2 films continue to be of key interest for numerous applications; however, effective doping and high metal to MoS2 contact resistance are challenges for future applications. We report on the self-assembly of oleylamine on top of MoS2 thin-films and the effective doping of MoS2 thin-film field effect transistors by oleylamine. Atomic force microscopy revealed that oleylamine organizes in lamellae domains on MoS2 thin films with similar characteristics of those previously observed on highly ordered pyrolytic graphite. A carrier concentration increase from 7.1 × 1011 cm-2 up to 1.9 × 1013 cm-2 at 0 V gate voltage is achieved together with a reduction of the contact resistance by a factor of 5 when using gold as metal contact. Furthermore, this non-covalent doping proves to be removable and reproducible among different flakes and does not degrade the electron mobility. Thus, this work opens the path for future works on controlling the doping of MoS2 by proper selection of the self-assembled species.

  1. Gate oxide shorts in nMOS transistors: Electrical properties and lifetime prediction method

    SciTech Connect

    Dababneh, S.A.; Hawkins, C.F.; Soden, J.M.

    1994-09-01

    Degradation in nMOS transistors from gate oxide shorts is dependent upon oxide trapping and interface state generation. Three distinct damage mechanisms were identified, including generation of: (1) electron traps in the bulk oxide by the injected holes, N{sub ox,h}, (2) electron traps in the bulk oxide by the injected electrons, N{sub ox,e}, and (3) interface states, N{sub ss}. The three damage mechanisms are incorporated into a device lifetime prediction method.

  2. Burnout Thresholds and Cross Section of Power MOS Transistors with Heavy Ions

    DTIC Science & Technology

    1990-02-01

    device -- regardless of manufacturer and device type. Tests performed with fission particles of Californium -252 indicated this to be indeed a...supported by Californium -252 test results. Fission particles of Cf-252 have a maximum range between 12 and 15 Am in silicon and decrease in LET with...Groninger, V, H. Strahan, and D. M. Long, "Burnout of Power MOS Transistors with Heavy Ions of Californium - 252," IEEE Trans. Nuc. Sci., NS-33, pp

  3. High performance and transparent multilayer MoS2 transistors: Tuning Schottky barrier characteristics

    NASA Astrophysics Data System (ADS)

    Hong, Young Ki; Yoo, Geonwook; Kwon, Junyeon; Hong, Seongin; Song, Won Geun; Liu, Na; Omkaram, Inturu; Yoo, Byungwook; Ju, Sanghyun; Kim, Sunkook; Oh, Min Suk

    2016-05-01

    Various strategies and mechanisms have been suggested for investigating a Schottky contact behavior in molybdenum disulfide (MoS2) thin-film transistor (TFT), which are still in much debate and controversy. As one of promising breakthrough for transparent electronics with a high device performance, we have realized MoS2 TFTs with source/drain electrodes consisting of transparent bi-layers of a conducting oxide over a thin film of low work function metal. Intercalation of a low work function metal layer, such as aluminum, between MoS2 and transparent source/drain electrodes makes it possible to optimize the Schottky contact characteristics, resulting in about 24-fold and 3 orders of magnitude enhancement of the field-effect mobility and on-off current ratio, respectively, as well as transmittance of 87.4 % in the visible wavelength range.

  4. Method of making self-aligned lightly-doped-drain structure for MOS transistors

    DOEpatents

    Weiner, Kurt H.; Carey, Paul G.

    2001-01-01

    A process for fabricating lightly-doped-drains (LDD) for short-channel metal oxide semiconductor (MOS) transistors. The process utilizes a pulsed laser process to incorporate the dopants, thus eliminating the prior oxide deposition and etching steps. During the process, the silicon in the source/drain region is melted by the laser energy. Impurities from the gas phase diffuse into the molten silicon to appropriately dope the source/drain regions. By controlling the energy of the laser, a lightly-doped-drain can be formed in one processing step. This is accomplished by first using a single high energy laser pulse to melt the silicon to a significant depth and thus the amount of dopants incorporated into the silicon is small. Furthermore, the dopants incorporated during this step diffuse to the edge of the MOS transistor gate structure. Next, many low energy laser pulses are used to heavily dope the source/drain silicon only in a very shallow region. Because of two-dimensional heat transfer at the MOS transistor gate edge, the low energy pulses are inset from the region initially doped by the high energy pulse. By computer control of the laser energy, the single high energy laser pulse and the subsequent low energy laser pulses are carried out in a single operational step to produce a self-aligned lightly-doped-drain-structure.

  5. Using a floating-gate MOS transistor as a transducer in a MEMS gas sensing system.

    PubMed

    Barranca, Mario Alfredo Reyes; Mendoza-Acevedo, Salvador; Flores-Nava, Luis M; Avila-García, Alejandro; Vazquez-Acosta, E N; Moreno-Cadenas, José Antonio; Casados-Cruz, Gaspar

    2010-01-01

    Floating-gate MOS transistors have been widely used in diverse analog and digital applications. One of these is as a charge sensitive device in sensors for pH measurement in solutions or using gates with metals like Pd or Pt for hydrogen sensing. Efforts are being made to monolithically integrate sensors together with controlling and signal processing electronics using standard technologies. This can be achieved with the demonstrated compatibility between available CMOS technology and MEMS technology. In this paper an in-depth analysis is done regarding the reliability of floating-gate MOS transistors when charge produced by a chemical reaction between metallic oxide thin films with either reducing or oxidizing gases is present. These chemical reactions need temperatures around 200 °C or higher to take place, so thermal insulation of the sensing area must be assured for appropriate operation of the electronics at room temperature. The operation principle of the proposal here presented is confirmed by connecting the gate of a conventional MOS transistor in series with a Fe(2)O(3) layer. It is shown that an electrochemical potential is present on the ferrite layer when reacting with propane.

  6. Using a Floating-Gate MOS Transistor as a Transducer in a MEMS Gas Sensing System

    PubMed Central

    Barranca, Mario Alfredo Reyes; Mendoza-Acevedo, Salvador; Flores-Nava, Luis M.; Avila-García, Alejandro; Vazquez-Acosta, E. N.; Moreno-Cadenas, José Antonio; Casados-Cruz, Gaspar

    2010-01-01

    Floating-gate MOS transistors have been widely used in diverse analog and digital applications. One of these is as a charge sensitive device in sensors for pH measurement in solutions or using gates with metals like Pd or Pt for hydrogen sensing. Efforts are being made to monolithically integrate sensors together with controlling and signal processing electronics using standard technologies. This can be achieved with the demonstrated compatibility between available CMOS technology and MEMS technology. In this paper an in-depth analysis is done regarding the reliability of floating-gate MOS transistors when charge produced by a chemical reaction between metallic oxide thin films with either reducing or oxidizing gases is present. These chemical reactions need temperatures around 200 °C or higher to take place, so thermal insulation of the sensing area must be assured for appropriate operation of the electronics at room temperature. The operation principle of the proposal here presented is confirmed by connecting the gate of a conventional MOS transistor in series with a Fe2O3 layer. It is shown that an electrochemical potential is present on the ferrite layer when reacting with propane. PMID:22163478

  7. Evolution of the MOS transistor - From conception to VLSI

    NASA Astrophysics Data System (ADS)

    Sah, Chih-Tang

    1988-10-01

    Historical developments of the MOSFET during the last 60 years are reviewed, from the 1928 patent disclosures of the field-effect conductivity modulation concept and the semiconductor triode structures proposed by Lilienfeld to the 1947 Shockley-originated efforts which led to the laboratory demonstration of the modern silicon MOSFET in 1960. A survey is then made of the milestones of the past 30 years leading to the latest submicron silicon logic CMOS and BICMOS (bipolar-junction transistor CMOS combined) arrays and the three-dimensional and ferroelectric extensions of Dennard's one-transistor DRAM cell. The status of the submicron lithographic technologies is summarized. Future trends of memory cell density and logic gate speed are projected. Comparisons of the switching speed of the silicon MOSFET with that of silicon bipolar and GaAs FETs are reviewed.

  8. Electrical control of the valley Hall effect in bilayer MoS2 transistors.

    PubMed

    Lee, Jieun; Mak, Kin Fai; Shan, Jie

    2016-05-01

    The valley degree of freedom of electrons in solids has been proposed as a new type of information carrier, beyond the electron charge and spin. The potential of two-dimensional semiconductor transition metal dichalcogenides in valley-based electronic and optoelectronic applications has recently been illustrated through experimental demonstrations of the optical orientation of the valley polarization and of the valley Hall effect in monolayer MoS2. However, the valley Hall conductivity in monolayer MoS2, a non-centrosymmetric crystal, cannot be easily tuned, which presents a challenge for the development of valley-based applications. Here, we show that the valley Hall effect in bilayer MoS2 transistors can be controlled with a gate voltage. The gate applies an electric field perpendicular to the plane of the material, breaking the inversion symmetry present in bilayer MoS2. The valley polarization induced by the longitudinal electrical current was imaged with Kerr rotation microscopy. The polarization was found to be present only near the edges of the device channel with opposite sign for the two edges, and was out-of-plane and strongly dependent on the gate voltage. Our observations are consistent with symmetry-dependent Berry curvature and valley Hall conductivity in bilayer MoS2.

  9. Negative Differential Transconductance in a MoS2 /WSe2 Heterojunction Field Effect Transistor

    NASA Astrophysics Data System (ADS)

    Zubair, Ahmad; Nourbakhsh, Amirhasan; Dresselhaus, Mildred; de Gendt, Stefan; Palacios, Tomas

    2015-03-01

    In this work, we demonstrate the negative transconductance in heterojunction transistors made of two-dimensional materials for the first time. Negative transconductance plays a key role in multi-valued logic/memory and frequency multiplication circuits. The simpler fabrication method of stacked van der Waals heterostructures compared to the conventional bulk semiconductors and large area CVD growth of the layered 2D materials systems makes it a prime candidate for scalable novel applications of their heterostructures. Vertically stacked MoS2/WSe2 heterostructures are fabricated by mechanical exfoliation and an in-house dry transfer process. A two-step process of e-beam lithography and metal deposition (Au on MoS2, and Pd on WSe2) were performed to fabricate n-type MoS2 and ambipolar WSe2 FET. The transfer characteristics on the non-overlapping regions shows the expected characteristics of the n-type, MoS2 FET and ambipolar WSe2 FET. At the same time, the transfer characteristics of the overlapping region between MoS2 and WSe2 show negative differential transconductance. With proper scaling and careful optimization this negative differential transconductance will lead to novel applications.

  10. Influence of water vapor on the electronic property of MoS2 field effect transistors.

    PubMed

    Shu, Jiapei; Wu, Gongtao; Gao, Song; Liu, Bo; Wei, Xianlong; Chen, Qing

    2017-03-02

    The influence of water vapor on the electronic property of MoS2 field effect transistors (FETs) is studied through controlled experiments. We fabricate supported and suspended FETs on the same piece of MoS2 to figure out the role of SiO2 substrate on the water sensing property of MoS2. The two kinds devices show similar response to water vapor and to different treatments, such as pumping in the vacuum, annealing at 500K and current annealing, indicating the substrate do not play an important role in MoS2 water sensor. Water adsorption is found to decrease the carrier mobility probably through introducing scattering center on the surface of MoS2. The threshold voltage and subthreshold swing of the FETs do not change obviously after introducing water vapor, indicating there is not obvious doping and trap introducing effects. Long time pumping in high vacuum and 500 K annealing show negligible effects on removing the water adsorption on the devices. Current annealing at high source-drain bias is found to be able to remove the water adsorption and set the FETs to their initial states. The mechanism is proposed to be through the hot carriers at high bias.

  11. A MoS2-based coplanar neuron transistor for logic applications.

    PubMed

    Hu, Shaogang; Liu, Y; Li, Huakai; Chen, Tupei; Yu, Q; Deng, Longjiang

    2017-04-04

    The human brain is an extremely complex system of 1010~1011 neurons. To construct brain-like neuromorphic hardware, neuron unit should be implemented effectively. Here, we report a neuron transistor based on MoS2 flake, which has the summation and threshold functions similar to biological neuron and may act as basic neuron unit in neuromorphic hardware. The neuron transistor is composed of a floating gate and two control gates. A heavily doped silicon substrate serves as the floating gate, while the two control gates are capacitively coupled with the floating gate. The neuron transistor can be well controlled by the two control gates individually or simultaneously. The drain current can be modulated by the input voltages at the control gates, which is useful in digital applications. While the current response of the neuron transistor has a large dependence on the magnitude of input signal, it shows little dependence on the frequency of input signal. To demonstrate the potential neuromorphic application of the neuron transistor, functions including abacus-like function, AND logic and OR logic are realized in the neuron transistor.

  12. Mimicking Neurotransmitter Release in Chemical Synapses via Hysteresis Engineering in MoS2 Transistors.

    PubMed

    Arnold, Andrew J; Razavieh, Ali; Nasr, Joseph R; Schulman, Daniel S; Eichfeld, Chad M; Das, Saptarshi

    2017-03-28

    Neurotransmitter release in chemical synapses is fundamental to diverse brain functions such as motor action, learning, cognition, emotion, perception, and consciousness. Moreover, improper functioning or abnormal release of neurotransmitter is associated with numerous neurological disorders such as epilepsy, sclerosis, schizophrenia, Alzheimer's disease, and Parkinson's disease. We have utilized hysteresis engineering in a back-gated MoS2 field effect transistor (FET) in order to mimic such neurotransmitter release dynamics in chemical synapses. All three essential features, i.e., quantal, stochastic, and excitatory or inhibitory nature of neurotransmitter release, were accurately captured in our experimental demonstration. We also mimicked an important phenomenon called long-term potentiation (LTP), which forms the basis of human memory. Finally, we demonstrated how to engineer the LTP time by operating the MoS2 FET in different regimes. Our findings could provide a critical component toward the design of next-generation smart and intelligent human-like machines and human-machine interfaces.

  13. Changes in electrical properties of MOS transistor induced by single 14 MeV neutron

    SciTech Connect

    Haider, F. A. Chee, F. P. Abu Hassan, H.; Saafie, S.; Afishah, A.

    2016-01-22

    Neutron radiation causes significant changes in the characteristics of MOS devices by the creation of oxide-trapped charge and interface traps. The degradation of the current gain of the GF4936 dual n-channel depletion mode MOS transistor, caused by neutron displacement defects, was measured using in-situ method during neutron irradiation. The average degradation of the gain current is 35 mA at maximum fluence of 2.0 × 10{sup 10} n/cm2 while with an average of 25 mA at minimum fluence of 5.0 × 10{sup 8} n/cm{sup 2}. The change in channel current gain increased proportionally with neutron fluence, meanwhile drain saturation current decreased proportionally with the neutron fluence.

  14. On the electrostatic control achieved in transistors based on multilayered MoS2: A first-principles study

    NASA Astrophysics Data System (ADS)

    Lu, Anh Khoa Augustin; Pourtois, Geoffrey; Luisier, Mathieu; Radu, Iuliana P.; Houssa, Michel

    2017-01-01

    In this work, the electrostatic control in metal-oxide-semiconductor field-effect transistors based on MoS2 is studied, with respect to the number of MoS2 layers in the channel and to the equivalent oxide thickness of the gate dielectric, using first-principles calculations combined with a quantum transport formalism. Our simulations show that a compromise exists between the drive current and the electrostatic control on the channel. When increasing the number of MoS2 layers, a degradation of the device performances in terms of subthreshold swing and OFF currents arises due to the screening of the MoS2 layers constituting the transistor channel.

  15. DETECTORS AND EXPERIMENTAL METHODS: Radiation response of pseudo-MOS transistors fabricated in hardened fully-depleted SIMOX SOI wafers

    NASA Astrophysics Data System (ADS)

    Bi, Da-Wei; Zhang, Zheng-Xuan; Zhang, Shuai; Chen, Ming; Yu, Wen-Jie; Wang, Ru; Tian, Hao; Liu, Zhang-Li

    2009-10-01

    The total dose radiation response of pseudo-MOS transistors fabricated in hardened and unhardened FD (fully-depleted) SIMOX (Separation by Implanted Oxygen) SOI (Silicon-on-insulator) wafers is presented. At 1 Mrad(Si) radiation dose, the threshold voltage shift of the pseudo-MOS transistor is reduced from -115.5 to -1.9 V by the hardening procedure. The centroid location of the net positive charge trapped in BOX, the hole-trap density and the hole capture fraction of BOX are also shown. The results suggest that hardened FD SIMOX SOI wafers can perform well in a radiation environment.

  16. Multiple MoS2 Transistors for Sensing Molecule Interaction Kinetics

    PubMed Central

    Nam, Hongsuk; Oh, Bo-Ram; Chen, Pengyu; Chen, Mikai; Wi, Sungjin; Wan, Wenjie; Kurabayashi, Katsuo; Liang, Xiaogan

    2015-01-01

    Atomically layered transition metal dichalcogenides (TMDCs) exhibit a significant potential to enable next-generation low-cost transistor biosensors that permit single-molecule-level quantification of biomolecules. To realize such potential biosensing capability, device-oriented research is needed for calibrating the sensor responses to enable the quantification of the affinities/kinetics of biomolecule interactions. In this work, we demonstrated MoS2-based transistor biosensors capable of detecting tumor necrosis factor – alpha (TNF-α) with a detection limit as low as 60 fM. Such a detection limit was achieved in both linear and subthreshold regimes of MoS2 transistors. In both regimes, all sets of transistors exhibited consistent calibrated responses with respect to TNF-α concentration, and they resulted in a standard curve, from which the equilibrium constant of the antibody-(TNF-α) pair was extracted to be KD = 369 ± 48 fM. Based on this calibrated sensor model, the time-dependent binding kinetics was also measured and the association/dissociation rates of the antibody-(TNF-α) pair were extracted to be (5.03 ± 0.16) × 108 M−1s−1 and (1.97 ± 0.08) × 10−4 s−1, respectively. This work advanced the critical device physics for leveraging the excellent electronic/structural properties of TMDCs in biosensing applications as well as the research capability in analyzing the biomolecule interactions with fM-level sensitivities. PMID:26014289

  17. Uncovering edge states and electrical inhomogeneity in MoS2 field-effect transistors

    PubMed Central

    Li, Xiao; Luan, Lan; Wu, Xiaoyu; Li, Wei; Yogeesh, Maruthi N.; Ghosh, Rudresh; Chu, Zhaodong; Akinwande, Deji; Niu, Qian; Lai, Keji

    2016-01-01

    The understanding of various types of disorders in atomically thin transition metal dichalcogenides (TMDs), including dangling bonds at the edges, chalcogen deficiencies in the bulk, and charges in the substrate, is of fundamental importance for TMD applications in electronics and photonics. Because of the imperfections, electrons moving on these 2D crystals experience a spatially nonuniform Coulomb environment, whose effect on the charge transport has not been microscopically studied. Here, we report the mesoscopic conductance mapping in monolayer and few-layer MoS2 field-effect transistors by microwave impedance microscopy (MIM). The spatial evolution of the insulator-to-metal transition is clearly resolved. Interestingly, as the transistors are gradually turned on, electrical conduction emerges initially at the edges before appearing in the bulk of MoS2 flakes, which can be explained by our first-principles calculations. The results unambiguously confirm that the contribution of edge states to the channel conductance is significant under the threshold voltage but negligible once the bulk of the TMD device becomes conductive. Strong conductance inhomogeneity, which is associated with the fluctuations of disorder potential in the 2D sheets, is also observed in the MIM images, providing a guideline for future improvement of the device performance. PMID:27444021

  18. Programmable Schottky Junctions Based on Ferroelectric Gated MoS2 Transistors

    NASA Astrophysics Data System (ADS)

    Xiao, Zhiyong; Song, Jingfeng; Drcharme, Stephen; Hong, Xia

    We report a programmable Schottky junction based on MoS2 field effect transistors with a SiO2 back gate and a ferroelectric copolymer poly(vinylidene-fluoride-trifluorethylene) (PVDF) top gate. We fabricated mechanically exfoliated single layer MoS2 flakes into two point devices via e-beam lithography, and deposited on the top of the devices ~20 nm PVDF thin films. The polarization of the PVDF layer is controlled locally by conducting atomic force microscopy. The devices exhibit linear ID-VD characteristics when the ferroelectric gate is uniformly polarized in one direction. We then polarized the gate into two domains with opposite polarization directions, and observed that the ID-VD characteristics of the MoS2 channel can be modulated between linear and rectified behaviors depending on the back gate voltage. The nonlinear ID-VD relation emerges when half of the channel is in the semiconductor phase while the other half is in the metallic phase, and it can be well described by the thermionic emission model with a Schottky barrier of ~0.5 eV. The Schottky junction can be erased by re-write the entire channel in the uniform polarization state. Our study facilitates the development of programmable, multifunctional nanoelectronics based on layered 2D TMDs..

  19. Ionic-Liquid Gated Few-layer MoS2 Field-Effect Transistors

    NASA Astrophysics Data System (ADS)

    Perera, Meeghage; Lin, Ming-Wei; Chuang, Hsun-Jen; Chamlagain, Bhim; Wang, Chongyu; Tan, Xuebin; Cheng, Mark Ming-Cheng; Zhou, Zhixian

    2013-03-01

    We report the electrical characterization of ionic-liquid-gated bilayer and few-layer MoS2 field-effect transistors. The extrinsic mobility of our ionic-liquid-gated devices exceeds 70 cm2V-1S-1 at 250 K, which is 1-2 orders of magnitude higher than that measured in the Si back-gate configuration (without ionic liquid). These devices also show ambipolar behavior with a high ON-OFF current ratio of > 107 for electrons and > 106 for holes, and a near ideal subthreshold swing (SS) of ~ 50 mV/decade at 250 K for the electron channel. More significantly, we show that the mobility increases from ~ 100 cm2V-1S-1 at 180 K to ~ 220 cm2V-1S-1 at 77K as the temperature decreases following a μ ~ T-γ dependence with γ ~ 1, indicating that the intrinsic phonon-limited mobility can be achieved in few-layer MoS2 FETs. We attribute the enhanced device performance to the drastic reduction of the Schottky barrier width (thus higher tunneling efficiency) via highly efficient band bending at the MoS2/metal interface afforded by the extremely large electrical double layer capacitance of the ionic liquid. This work was supported by NSF (No. ECCS-1128297).

  20. Enhancement of photodetection characteristics of MoS2 field effect transistors using surface treatment with copper phthalocyanine.

    PubMed

    Pak, Jinsu; Jang, Jingon; Cho, Kyungjune; Kim, Tae-Young; Kim, Jae-Keun; Song, Younggul; Hong, Woong-Ki; Min, Misook; Lee, Hyoyoung; Lee, Takhee

    2015-11-28

    Recently, two-dimensional materials such as molybdenum disulfide (MoS2) have been extensively studied as channel materials for field effect transistors (FETs) because MoS2 has outstanding electrical properties such as a low subthreshold swing value, a high on/off ratio, and good carrier mobility. In this study, we characterized the electrical and photo-responsive properties of MoS2 FET when stacking a p-type organic copper phthalocyanine (CuPc) layer on the MoS2 surface. We observed that the threshold voltage of MoS2 FET could be controlled by stacking the CuPc layers due to a charge transfer phenomenon at the interface. Particularly, we demonstrated that CuPc/MoS2 hybrid devices exhibited high performance as a photodetector compared with the pristine MoS2 FETs, caused by more electron-hole pairs separation at the p-n interface. Furthermore, we found the optimized CuPc thickness (∼2 nm) on the MoS2 surface for the best performance as a photodetector with a photoresponsivity of ∼1.98 A W(-1), a detectivity of ∼6.11 × 10(10) Jones, and an external quantum efficiency of ∼12.57%. Our study suggests that the MoS2 vertical hybrid structure with organic material can be promising as efficient photodetecting devices and optoelectronic circuits.

  1. A theoretical modeling of photocurrent generation and decay in layered MoS2 thin-film transistor photosensors

    NASA Astrophysics Data System (ADS)

    Hur, Ji-Hyun; Park, Junghak; Jeon, Sanghun

    2017-02-01

    A model that universally describes the characteristics of photocurrent in molybdenum disulphide (MoS2) thin-film transistor (TFT) photosensors in both ‘light on’ and ‘light off’ conditions is presented for the first time. We considered possible material-property dependent carrier generation and recombination mechanisms in layered MoS2 channels with different numbers of layers. We propose that the recombination rates that are mainly composed of direct band-to-band recombination and interface trap-involved recombination change on changing the light condition and the number of layers. By comparing the experimental results, it is shown that the model performs well in describing the photocurrent behaviors of MoS2 TFT photosensors, including the photocurrent generation under illumination and a hugely long time persistent trend of the photocurrent decay in the dark condition, for a range of MoS2 layer numbers.

  2. New highly linear tunable transconductor circuits with low number of MOS transistors

    NASA Astrophysics Data System (ADS)

    Yucel, Firat; Yuce, Erkan

    2016-08-01

    In this article, two new highly linear tunable transconductor circuits are proposed. The transconductors employ only six MOS transistors operated in saturation region. The second transconductor is derived from the first one with a slight modification. Transconductance of both transconductors can be tuned by a control voltage. Both of the transconductors do not need any additional bias voltages and currents. Another important feature of the transconductors is their high input and output impedances for cascadability with other circuits. Besides, total harmonic distortions are less than 1.5% for both transconductors. A positive lossless grounded inductor simulator with a grounded capacitor is given as an application example of the transconductors. Simulation and experimental test results are included to show effectiveness of the proposed circuits.

  3. Monolayer MoS2 Bandgap Modulation by Dielectric Environments and Tunable Bandgap Transistors

    PubMed Central

    Ryou, Junga; Kim, Yong-Sung; KC, Santosh; Cho, Kyeongjae

    2016-01-01

    Semiconductors with a moderate bandgap have enabled modern electronic device technology, and the current scaling trends down to nanometer scale have introduced two-dimensional (2D) semiconductors. The bandgap of a semiconductor has been an intrinsic property independent of the environments and determined fundamental semiconductor device characteristics. In contrast to bulk semiconductors, we demonstrate that an atomically thin two-dimensional semiconductor has a bandgap with strong dependence on dielectric environments. Specifically, monolayer MoS2 bandgap is shown to change from 2.8 eV to 1.9 eV by dielectric environment. Utilizing the bandgap modulation property, a tunable bandgap transistor, which can be in general made of a two-dimensional semiconductor, is proposed. PMID:27378032

  4. Pure valley- and spin-entangled states in a MoS2-based bipolar transistor

    NASA Astrophysics Data System (ADS)

    Bai, Chunxu; Zou, Yonglian; Lou, Wen-Kai; Chang, Kai

    2014-11-01

    In this study, we show that the local Andreev reflection not only can be tuned largely by the type of the normal metal electrode, it also is related to the electrostatic potential in the superconductor region in a MoS2-based n (p ) -type metal/superconductor junction. In a MoS2-based n -type metal/n (p ) -type superconductor/p -type metal (n Sp ) transistor, nonlocal pure valley- and spin-entangled current can be tuned by the length and local gate voltage of a superconductor region. In particular, switching the quasiparticle type in both structures results in a series of intriguing features. Such an effect is not attainable in a graphene-based junction where the electron-hole symmetry enables the symmetry results to be observed. Besides, we have shown that the crossed Andreev reflection exhibits a maximum around ξ /2 instead of the exponential decay behavior in conventional superconductors and a maximum around ξ in the graphene material. The proposed straightforward experimental design and pure valley- and spin-entangled state can pave the way for a wider use in the entanglement based on material group-VI dichalcogenides.

  5. Charge neutral MoS2 field effect transistors through oxygen plasma treatment

    NASA Astrophysics Data System (ADS)

    Dhall, Rohan; Li, Zhen; Kosmowska, Ewa; Cronin, Stephen B.

    2016-11-01

    Lithographically fabricated MoS2 field effect transistors suffer from several critical imperfections, including low sub-threshold swings, large turn-on gate voltages (VT), and wide device-to-device variability. The large magnitude and variability of VT stems from unclean interfaces, trapped charges in the underlying substrate, and sulfur vacancies created during the mechanical exfoliation process. In this study, we demonstrate a simple and reliable oxygen plasma treatment, which mitigates the effects of unintentional doping created by surface defect sites, such as S vacancies, and surface contamination. This plasma treatment restores charge neutrality to the MoS2 and shifts the threshold turn-on voltage towards 0 V. Out of the 10 devices measured, all exhibit a shift of the FET turn-on voltage from an average of -18 V to -2 V. The oxygen plasma treatment passivates these defects, which reduces surface scattering, causing increased mobility and improved subthreshold swing. For as-prepared devices with low mobilities (˜0.01 cm2/V s), we observe up to a 190-fold increase in mobility after exposure to the oxygen plasma. Perhaps the most important aspect of this oxygen plasma treatment is that it reduces the device-to-device variability, which is a crucial factor in realizing any practical application of these devices.

  6. Performance Investigation of Multilayer MoS2 Thin-Film Transistors Fabricated via Mask-free Optically Induced Electrodeposition.

    PubMed

    Li, Meng; Liu, Na; Li, Pan; Shi, Jialin; Li, Guangyong; Xi, Ning; Wang, Yuechao; Liu, Lianqing

    2017-03-08

    Transition metal dichalcogenides, particularly MoS2, have recently received enormous interest in explorations of the physics and technology of nanodevice applications because of their excellent optical and electronic properties. Although monolayer MoS2 has been extensively investigated for various possible applications, its difficulty of fabrication renders it less appealing than multilayer MoS2. Moreover, multilayer MoS2, with its inherent high electronic/photonic state densities, has higher output driving capabilities and can better satisfy the ever-increasing demand for versatile devices. Here, we present multilayer MoS2 back-gate thin-film transistors (TFTs) that can achieve a relatively low subthreshold swing of 0.75 V/decade and a high mobility of 41 cm(2)·V(-1)·s(-1), which exceeds the typical mobility value of state-of-the-art amorphous silicon-based TFTs by a factor of 80. Ag and Au electrode-based MoS2 TFTs were fabricated by a convenient and rapid process. Then we performed a detailed analysis of the impacts of metal contacts and MoS2 film thickness on electronic performance. Our findings show that smoother metal contacts exhibit better electronic characteristics and that MoS2 film thickness should be controlled within a reasonable range of 30-40 nm to obtain the best mobility values, thereby providing valuable insights regarding performance enhancement for MoS2 TFTs. Additionally, to overcome the limitations of the conventional fabrication method, we employed a novel approach known as optically induced electrodeposition (OIE), which allows the flexible and precise patterning of metal films and enables rapid and mask-free device fabrication, for TFT fabrication.

  7. Electronic properties and transistors of the NbS2-MoS2-NbS2 nanoribbon heterostructure.

    PubMed

    Liu, Qi; OuYang, Fangping; Yang, Zhixiong; Peng, Shenglin; Zhou, Wenzhe; Zou, Hui; Long, Mengqiu; Pan, Jiangling

    2016-12-13

    Based on density function theory(DFT) and nonequilibrium Green's functions(NEGF), we construct a NbS2-MoS2-NbS2 nanoribbon inplane heterostructure. The effects of the channel length, width, chirality and vacancy of the heterostructure on the transport properties are systematically investigated. The electron transport of the armchair-edge heterostructure device shows ballistic transport properties, while the zigzag-edge heterostructure device exhibits resonance tunneling transport properties. Further study indicates the NbS2-MoS2-NbS2 field effect transistors(FETs) to be excellent ambipolar transistors. The FETs have high performances with current on/off ratio 4.7×10(5) and subthreshold swing 90mV/decade with the channel length m=16 and width n=6. The increase of the channel length will sharply reduce the off-state current and enhance the performances of the devices significantly.

  8. Electronic properties and transistors of the NbS2-MoS2-NbS2 NR heterostructure

    NASA Astrophysics Data System (ADS)

    Liu, Qi; Ouyang, Fangping; Yang, Zhixiong; Peng, Shenglin; Zhou, Wenzhe; Zou, Hui; Long, Mengqiu; Pan, Jiangling

    2017-02-01

    Based on density function theory and nonequilibrium Green’s functions, we construct a NbS2-MoS2-NbS2 NR inplane heterostructure. The effects of channel length, width, chirality and vacancy of the heterostructure on transport properties are systematically investigated. The electron transport of the armchair-edge heterostructure device shows ballistic transport properties, while the zigzag-edge heterostructure device exhibits resonance tunneling transport properties. Further study indicates NbS2-MoS2-NbS2 field effect transistors (FETs) to be excellent ambipolar transistors. The FETs have high performances with current on/off ratio 4.7 × 105 and subthreshold swing 90 mV/decade with channel length m = 16 and width n = 6. Increases in the channel length sharply reduce the off-state current and enhance the performance of the devices significantly.

  9. MoS2 /Rubrene van der Waals Heterostructure: Toward Ambipolar Field-Effect Transistors and Inverter Circuits.

    PubMed

    He, Xuexia; Chow, WaiLeong; Liu, Fucai; Tay, BengKang; Liu, Zheng

    2017-01-01

    2D transition metal dichalcogenides are promising channel materials for the next-generation electronic device. Here, vertically 2D heterostructures, so called van der Waals solids, are constructed using inorganic molybdenum sulfide (MoS2 ) few layers and organic crystal - 5,6,11,12-tetraphenylnaphthacene (rubrene). In this work, ambipolar field-effect transistors are successfully achieved based on MoS2 and rubrene crystals with the well balanced electron and hole mobilities of 1.27 and 0.36 cm(2) V(-1) s(-1) , respectively. The ambipolar behavior is explained based on the band alignment of MoS2 and rubrene. Furthermore, being a building block, the MoS2 /rubrene ambipolar transistors are used to fabricate CMOS (complementary metal oxide semiconductor) inverters that show good performance with a gain of 2.3 at a switching threshold voltage of -26 V. This work paves a way to the novel organic/inorganic ultrathin heterostructure based flexible electronics and optoelectronic devices.

  10. Ab initio simulation of single- and few-layer MoS2 transistors: Effect of electron-phonon scattering

    NASA Astrophysics Data System (ADS)

    Szabó, Áron; Rhyner, Reto; Luisier, Mathieu

    2015-07-01

    In this paper, we present full-band atomistic quantum transport simulations of single- and few-layer MoS2 field-effect transistors (FETs) including electron-phonon scattering. The Hamiltonian and the electron-phonon coupling constants are determined from ab initio density-functional-theory calculations. It is observed that the phonon-limited electron mobility is enhanced with increasing layer thicknesses and decreases at high charge concentrations. The electrostatic control is found to be crucial even for a single-layer MoS2 device. With a single-gate configuration, the double-layer MoS2 FET shows the best intrinsic performance with an ON current, ION=685 μ A /μ m , but with a double-gate contact the transistor with a triple-layer channel delivers the highest current with ION=1850 μ A /μ m . The charge in the channel is almost independent of the number of MoS2 layers, but the injection velocity increases significantly with the channel thickness in the double-gate devices due to the reduced electron-phonon scattering rates in multilayer structures. We demonstrate further that the ballistic limit of transport is not suitable for the simulation of MX 2 FETs because of the artificial negative differential resistance it predicts.

  11. Non-Faradaic Electrochemical Detection of Exocytosis from Mast and Chromaffin Cells Using Floating-Gate MOS Transistors

    PubMed Central

    Jayant, Krishna; Singhai, Amit; Cao, Yingqiu; Phelps, Joshua B.; Lindau, Manfred; Holowka, David A.; Baird, Barbara A.; Kan, Edwin C.

    2015-01-01

    We present non-faradaic electrochemical recordings of exocytosis from populations of mast and chromaffin cells using chemoreceptive neuron MOS (CνMOS) transistors. In comparison to previous cell-FET-biosensors, the CνMOS features control (CG), sensing (SG) and floating gates (FG), allows the quiescent point to be independently controlled, is CMOS compatible and physically isolates the transistor channel from the electrolyte for stable long-term recordings. We measured exocytosis from RBL-2H3 mast cells sensitized by IgE (bound to high-affinity surface receptors FcεRI) and stimulated using the antigen DNP-BSA. Quasi-static I-V measurements reflected a slow shift in surface potential () which was dependent on extracellular calcium ([Ca]o) and buffer strength, which suggests sensitivity to protons released during exocytosis. Fluorescent imaging of dextran-labeled vesicle release showed evidence of a similar time course, while un-sensitized cells showed no response to stimulation. Transient recordings revealed fluctuations with a rapid rise and slow decay. Chromaffin cells stimulated with high KCl showed both slow shifts and extracellular action potentials exhibiting biphasic and inverted capacitive waveforms, indicative of varying ion-channel distributions across the cell-transistor junction. Our approach presents a facile method to simultaneously monitor exocytosis and ion channel activity with high temporal sensitivity without the need for redox chemistry. PMID:26686301

  12. Enhanced carrier mobility of multilayer MoS2 thin-film transistors by Al2O3 encapsulation

    NASA Astrophysics Data System (ADS)

    Kim, Seong Yeoul; Park, Seonyoung; Choi, Woong

    2016-10-01

    We report the effect of Al2O3 encapsulation on the carrier mobility and contact resistance of multilayer MoS2 thin-film transistors by statistically investigating 70 devices with SiO2 bottom-gate dielectric. After Al2O3 encapsulation by atomic layer deposition, calculation based on Y-function method indicates that the enhancement of carrier mobility from 24.3 cm2 V-1 s-1 to 41.2 cm2 V-1 s-1 occurs independently from the reduction of contact resistance from 276 kΩ.μm to 118 kΩ.μm. Furthermore, contrary to the previous literature, we observe a negligible effect of thermal annealing on contact resistance and carrier mobility during the atomic layer deposition of Al2O3. These results demonstrate that Al2O3 encapsulation is a useful method of improving the carrier mobility of multilayer MoS2 transistors, providing important implications on the application of MoS2 and other two-dimensional materials into high-performance transistors.

  13. Nanoscale-Barrier Formation Induced by Low-Dose Electron-Beam Exposure in Ultrathin MoS2 Transistors.

    PubMed

    Matsunaga, Masahiro; Higuchi, Ayaka; He, Guanchen; Yamada, Tetsushi; Krüger, Peter; Ochiai, Yuichi; Gong, Yongji; Vajtai, Robert; Ajayan, Pulickel M; Bird, Jonathan P; Aoki, Nobuyuki

    2016-10-05

    Utilizing an innovative combination of scanning-probe and spectroscopic techniques, supported by first-principles calculations, we demonstrate how electron-beam exposure of field-effect transistors, implemented from ultrathin molybdenum disulfide (MoS2), may cause nanoscale structural modifications that in turn significantly modify the electrical operation of these devices. Quite surprisingly, these modifications are induced by even the relatively low electron doses used in conventional electron-beam lithography, which are found to induce compressive strain in the atomically thin MoS2. Likely arising from sulfur-vacancy formation in the exposed regions, the strain gives rise to a local widening of the MoS2 bandgap, an idea that is supported both by our experiment and by the results of first-principles calculations. A nanoscale potential barrier develops at the boundary between exposed and unexposed regions and may cause extrinsic variations in the resulting electrical characteristics exhibited by the transistor. The widespread use of electron-beam lithography in nanofabrication implies that the presence of such strain must be carefully considered when seeking to harness the potential of atomically thin transistors. At the same time, this work also promises the possibility of exploiting the strain as a means to achieve "bandstructure engineering" in such devices.

  14. Optically transparent thin-film transistors based on 2D multilayer MoS2 and indium zinc oxide electrodes

    NASA Astrophysics Data System (ADS)

    Kwon, Junyeon; Hong, Young Ki; Kwon, Hyuk-Jun; Park, Yu Jin; Yoo, Byungwook; Kim, Jiwan; Grigoropoulos, Costas P.; Oh, Min Suk; Kim, Sunkook

    2015-01-01

    We report on optically transparent thin film transistors (TFTs) fabricated using multilayered molybdenum disulfide (MoS2) as the active channel, indium tin oxide (ITO) for the back-gated electrode and indium zinc oxide (IZO) for the source/drain electrodes, respectively, which showed more than 81% transmittance in the visible wavelength. In spite of a relatively large Schottky barrier between MoS2 and IZO, the n-type behavior with a field-effect mobility (μeff) of 1.4 cm2 V-1 s-1 was observed in as-fabricated transparent MoS2 TFT. In order to enhance the performances of transparent MoS2 TFTs, a picosecond pulsed laser was selectively irradiated onto the contact region of the IZO electrodes. Following laser annealing, μeff increased to 4.5 cm2 V-1 s-1, and the on-off current ratio (Ion/Ioff) increased to 104, which were attributed to the reduction of the contact resistance between MoS2 and IZO.

  15. Investigation of chemical vapour deposition MoS2 field effect transistors on SiO2 and ZrO2 substrates.

    PubMed

    Liu, Xi; Chai, Yang; Liu, Zhaojun

    2017-04-21

    With the development of portable electronics, higher performance transistors are required to reduce the form factor and improve the performance of the devices. The key issue relies on developing transistors with outstanding electrical properties and low energy consumption at small scale. Here we demonstrate chemical vapor deposition (CVD) grown MoS2 transistors with a high on/off ratio using ZrO2 as a gate dielectric. Using 10 nm thick ZrO2, the transistor has an on/off ratio of 10(8), a sub-threshold swing of 0.1 V/dec, and a mobility of 64.66 cm(2) V(-1) s(-1). Compared to the MoS2 devices grown on 300 nm SiO2, the electrical performance demonstrates an all round improvement, which indicates the high crystalline quality of MoS2/ZrO2. Owing to the high-k ZrO2 dielectrics, the MoS2 transistor has a high on/off ratio, a low operating voltage, and good channel modulation capability which ensures that MoS2 is a good candidate for low power electronics.

  16. Investigation of chemical vapour deposition MoS2 field effect transistors on SiO2 and ZrO2 substrates

    NASA Astrophysics Data System (ADS)

    Liu, Xi; Chai, Yang; Liu, Zhaojun

    2017-04-01

    With the development of portable electronics, higher performance transistors are required to reduce the form factor and improve the performance of the devices. The key issue relies on developing transistors with outstanding electrical properties and low energy consumption at small scale. Here we demonstrate chemical vapor deposition (CVD) grown MoS2 transistors with a high on/off ratio using ZrO2 as a gate dielectric. Using 10 nm thick ZrO2, the transistor has an on/off ratio of 108, a sub-threshold swing of 0.1 V/dec, and a mobility of 64.66 cm2 V‑1 s‑1. Compared to the MoS2 devices grown on 300 nm SiO2, the electrical performance demonstrates an all round improvement, which indicates the high crystalline quality of MoS2/ZrO2. Owing to the high-k ZrO2 dielectrics, the MoS2 transistor has a high on/off ratio, a low operating voltage, and good channel modulation capability which ensures that MoS2 is a good candidate for low power electronics.

  17. Caractérisation des dégradations de transistors MOS de puissance sous irradiations

    NASA Astrophysics Data System (ADS)

    Bendada, E.; Raïs, K.; Mialhe, P.

    1997-11-01

    The aim of this work is the characterization of D-MOS (HEXFET) structure before and after irradiations. An innovative method for device characterisation is experimented to quantify radiation effects. This study is based on the determination of importants parameters: series resitance, ideality factor, reverse recombination and reverse diffusion currents of the substrate-drain junction by the analysis of its current voltage characteristics. The form of I V characteristics of the substrate-drain junction with operating conditions is found dependent of defects induced by irradiations. It is shown that values of the series resistance, the ideality factor and the reverse recombination current increases with the gate voltage and with the dose absorbed. The reverse diffusion current is shown to be not albered by radiation exposures. Une nouvelle méthode de caractérisation de la dégradation sous irradiations des transistors à structure D-MOS de type HEXFET est proposée. Elle est basée sur l'analyse des propriétés de la diode substrat-drain en utilisant les méthodes bien établies de modélisation des jonctions p-n. La description des caractéristiques courant-tension à l'aide des modèles permettant de séparer les processus de diffusion et de recombinaison des porteurs, conduit à déterminer d'une manière simple des paramètres importants: résistance série, facteur de qualité, courant inverse de recombinaison et courant inverse de diffusion. La forme des caractéristiques courant-tension de la jonction avec les conditions de fonctionnement est trouvée dépendante des défauts induits par les irradiations. Il est montré que les valeurs de la résistance série, du facteur de qualité et du courant inverse de recombinaison augmentent avec la tension de grille et avec la dose absorbée. Le courant inverse de diffusion est non altéré par l'exposition aux radiations.

  18. Enhanced photoresponsivity of multilayer MoS2 transistors using high work function MoOx overlayer

    NASA Astrophysics Data System (ADS)

    Yoo, Geonwook; Hong, Seongin; Heo, Junseok; Kim, Sunkook

    2017-01-01

    Using thin sub-stoichiometric molybdenum trioxide (MoOx, x < 3) overlayer, we demonstrate over 20-folds enhanced photoresponsivity of multilayer MoS2 field-effect transistor. The fabricated device exhibits field-effect mobility (μFE) of up to 41.4 cm2/V s and threshold voltage (VTH) of -9.3 V, which is also modulated by the MoOx overlayer. The MoOx layer (˜25 nm), commonly known for a high work function (˜6.8 eV) material with a band gap of ˜3 eV, is evaporated on top of the MoS2 channel and confirmed by the transmission electron microscope analysis. The electrical and optical modulation effects are associated with interfacial charge transfer and thus an induced built-in electric field at the MoS2/MoOx interface. The results show that high work function MoOx can be a promising heterostructure material in order to enhance the photoresponse characteristics of MoS2-based devices.

  19. Enhancement-mode operation of multilayer MoS2 transistors with a fluoropolymer gate dielectric layer

    NASA Astrophysics Data System (ADS)

    Yoo, Geonwook; Choi, Sol Lea; Lee, Suelbe; Yoo, Byungwook; Kim, Sunkook; Oh, Min Suk

    2016-06-01

    Enhancement-mode multilayer molybdenum disulfide (MoS2) field-effect transistors (FETs), which are an immensely important component toward low-power electronics based on a two-dimensional layered semiconductor, are demonstrated using the fluoropolymer CYTOP as a gate dielectric. The fabricated devices exhibit threshold voltage (VTH) of ˜5.7 V with field-effect mobility (μFE) of up to 82.3 cm2/V s, and the characteristics are compared with the depletion-mode characteristics of MoS2 FETs with the cross-linked Poly(4-vinylphenol) gate dielectric (VTH ˜ -7.8 V). UV photoelectron spectroscopy analysis indicates that increased surface potential due to the surface dipole effect of the fluorine group influences the positive VTH shift.

  20. Impact of contact resistance on the electrical properties of MoS2 transistors at practical operating temperatures

    PubMed Central

    Fisichella, Gabriele; Piazza, Aurora; Di Franco, Salvatore; Greco, Giuseppe; Agnello, Simonpietro; Roccaforte, Fabrizio

    2017-01-01

    Molybdenum disulphide (MoS2) is currently regarded as a promising material for the next generation of electronic and optoelectronic devices. However, several issues need to be addressed to fully exploit its potential for field effect transistor (FET) applications. In this context, the contact resistance, R C, associated with the Schottky barrier between source/drain metals and MoS2 currently represents one of the main limiting factors for suitable device performance. Furthermore, to gain a deeper understanding of MoS2 FETs under practical operating conditions, it is necessary to investigate the temperature dependence of the main electrical parameters, such as the field effect mobility (μ) and the threshold voltage (V th). This paper reports a detailed electrical characterization of back-gated multilayer MoS2 transistors with Ni source/drain contacts at temperatures from T = 298 to 373 K, i.e., the expected range for transistor operation in circuits/systems, considering heating effects due to inefficient power dissipation. From the analysis of the transfer characteristics (I D−V G) in the subthreshold regime, the Schottky barrier height (ΦB ≈ 0.18 eV) associated with the Ni/MoS2 contact was evaluated. The resulting contact resistance in the on-state (electron accumulation in the channel) was also determined and it was found to increase with T as R C proportional to T 3.1. The contribution of R C to the extraction of μ and V th was evaluated, showing a more than 10% underestimation of μ when the effect of R C is neglected, whereas the effect on V th is less significant. The temperature dependence of μ and V th was also investigated. A decrease of μ proportional to 1/T α with α = 1.4 ± 0.3 was found, indicating scattering by optical phonons as the main limiting mechanism for mobility above room temperature. The value of V th showed a large negative shift (about 6 V) increasing the temperature from 298 to 373 K, which was explained in terms of electron

  1. Improving Breakdown Behavior by Substrate Bias in a Novel Double Epi-layer Lateral Double Diffused MOS Transistor

    NASA Astrophysics Data System (ADS)

    Li, Qi; Wang, Wei-Dong; Liu, Yun; Wei, Xue-Ming

    2012-02-01

    A new lateral double diffused MOS (LDMOS) transistor with a double epitaxial layer formed by an n-type substrate and a p-type epitaxial layer is reported (DEL LDMOS). The mechanism of the improved breakdown characteristic is that the high electric field around the drain is reduced by substrate reverse bias, which causes the redistribution of the bulk electric field in the drift region, and the vertical blocking voltage is shared by the drain side and the source side. The numerical results indicate that the trade-off between breakdown voltage and on-resistance of the proposed device is improved greatly in comparison to that of the conventional LDMOS.

  2. Enhancing Photoresponsivity of Self-Aligned MoS2 Field-Effect Transistors by Piezo-Phototronic Effect from GaN Nanowires.

    PubMed

    Liu, Xingqiang; Yang, Xiaonian; Gao, Guoyun; Yang, Zhenyu; Liu, Haitao; Li, Qiang; Lou, Zheng; Shen, Guozhen; Liao, Lei; Pan, Caofeng; Lin Wang, Zhong

    2016-08-23

    We report high-performance self-aligned MoS2 field-effect transistors (FETs) with enhanced photoresponsivity by the piezo-phototronic effect. The FETs are fabricated based on monolayer MoS2 with a piezoelectric GaN nanowire (NW) as the local gate, and a self-aligned process is employed to define the source/drain electrodes. The fabrication method allows the preservation of the intrinsic property of MoS2 and suppresses the scattering center density in the MoS2/GaN interface, which results in high electrical and photoelectric performances. MoS2 FETs with channel lengths of ∼200 nm have been fabricated with a small subthreshold slope of 64 mV/dec. The photoresponsivity is 443.3 A·W(-1), with a fast response and recovery time of ∼5 ms under 550 nm light illumination. When strain is introduced into the GaN NW, the photoresponsivity is further enhanced to 734.5 A·W(-1) and maintains consistent response and recovery time, which is comparable with that of the mechanical exfoliation of MoS2 transistors. The approach presented here opens an avenue to high-performance top-gated piezo-enhanced MoS2 photodetectors.

  3. High-performance, highly bendable MoS2 transistors with high-k dielectrics for flexible low-power systems.

    PubMed

    Chang, Hsiao-Yu; Yang, Shixuan; Lee, Jongho; Tao, Li; Hwang, Wan-Sik; Jena, Debdeep; Lu, Nanshu; Akinwande, Deji

    2013-06-25

    While there has been increasing studies of MoS2 and other two-dimensional (2D) semiconducting dichalcogenides on hard conventional substrates, experimental or analytical studies on flexible substrates has been very limited so far, even though these 2D crystals are understood to have greater prospects for flexible smart systems. In this article, we report detailed studies of MoS2 transistors on industrial plastic sheets. Transistor characteristics afford more than 100x improvement in the ON/OFF current ratio and 4x enhancement in mobility compared to previous flexible MoS2 devices. Mechanical studies reveal robust electronic properties down to a bending radius of 1 mm which is comparable to previous reports for flexible graphene transistors. Experimental investigation identifies that crack formation in the dielectric is the responsible failure mechanism demonstrating that the mechanical properties of the dielectric layer is critical for realizing flexible electronics that can accommodate high strain. Our uniaxial tensile tests have revealed that atomic-layer-deposited HfO2 and Al2O3 films have very similar crack onset strain. However, crack propagation is slower in HfO2 dielectric compared to Al2O3 dielectric, suggesting a subcritical fracture mechanism in the thin oxide films. Rigorous mechanics modeling provides guidance for achieving flexible MoS2 transistors that are reliable at sub-mm bending radius.

  4. Method of making V-MOS field effect transistors utilizing a two-step anisotropic etching and ion implantation

    NASA Technical Reports Server (NTRS)

    Jhabvala, M. D. (Inventor)

    1981-01-01

    A method of making V-MOS field effect transistors is disclosed wherein a masking layer is first formed over a surface of a crystalline substrate. An aperture is then formed in the masking layer to expose the surface of the substrate. An anisotropic etchant is applied to the exposed surface so that a groove having a decreasing width within increasing depth is formed. However, the etch is not allowed to go to completion with the result that a partially formed V-shaped groove is formed. Ions are accelerated through the aperture for implantation in the crystalline substrate in the lower portion of the partially formed V-shaped groove. Thereafter, an anisotropic etchant is reapplied to the partially formed V-shaped groove, and the etch is allowed to go to completion.

  5. Hopping conduction and random telegraph signal in an exfoliated multilayer MoS2 field-effect transistor

    NASA Astrophysics Data System (ADS)

    Li, Lijun; Lee, Inyeal; Youn, Doo-Hyeb; Kim, Gil-Ho

    2017-02-01

    We investigate the hopping conduction and random telegraph signal caused by various species of interface charge scatterers in a MoS2 multilayer field-effect transistor. The temperature dependence of the channel resistivity shows that at low temperatures and low carrier densities the carrier transport is via Mott variable range hopping with a hopping length changing from 41 to 80 nm. The hopping conduction was due to electron tunneling through localized band tail states formed by the scatterers located in the vicinity of the MoS2 layer. In the temperature range of 40-70 K, we observed random telegraph signal (RTS) that is caused by the capture and emission of a carrier by the interface traps that are located away from the layer. These traps form strong potential that interact with the layer and change the potential profile of the electron system. The characteristics of RTS depend strongly on gate bias and temperature, as well as the application of a magnetic field.

  6. Hopping conduction and random telegraph signal in an exfoliated multilayer MoS2 field-effect transistor.

    PubMed

    Li, Lijun; Lee, Inyeal; Youn, Doo-Hyeb; Kim, Gil-Ho

    2017-02-17

    We investigate the hopping conduction and random telegraph signal caused by various species of interface charge scatterers in a MoS2 multilayer field-effect transistor. The temperature dependence of the channel resistivity shows that at low temperatures and low carrier densities the carrier transport is via Mott variable range hopping with a hopping length changing from 41 to 80 nm. The hopping conduction was due to electron tunneling through localized band tail states formed by the scatterers located in the vicinity of the MoS2 layer. In the temperature range of 40-70 K, we observed random telegraph signal (RTS) that is caused by the capture and emission of a carrier by the interface traps that are located away from the layer. These traps form strong potential that interact with the layer and change the potential profile of the electron system. The characteristics of RTS depend strongly on gate bias and temperature, as well as the application of a magnetic field.

  7. The Effect of Substrate on the Electron Transport Properties of MoS2 Field-Effect Transistors

    NASA Astrophysics Data System (ADS)

    Chamlagain, Bhim; Chuang, Hsun-Jen; Perera, Meeghage Madusanka; Zhou, Zhixian

    2015-03-01

    Substrate plays an important role in the performance of field-effect transistors (FETs) with two-dimensional transition metal dichalcogenide (TMD) channels. In this work, we systematically study the transport properties of few-layer MoS2 FETs consistently fabricated on various substrates including SiO2, Al2O3, SiO2 modified by octadecyltrimethoxysilane (OTMS) self-assembled monolayers (SAMs), and hexagonal boron nitride (hBN). Standard four-probe electrical transport measurement was carried out at temperatures ranging from 77 K to room temperature to understand the scattering mechanism. Surprisingly, the room temperature mobility extracted from devices on different substrates is nearly the same. In contrast, a substantially higher mobility is observed in MoS2 devices on clean hBN substrates at low temperatures. The role of various sources of scattering originating from the substrate and the channel/substrate interface such as charged impurities, charge traps, surface roughness, and remote surface optical phonons will be discussed. This work was supported by NSF (No. ECCS-1128297) and Thomas C. Rumble Fellowship Award.

  8. A Commercial off-the-shelf pMOS Transistor as X-ray and Heavy Ion Detector

    NASA Astrophysics Data System (ADS)

    Silveira, M. A. G.; Melo, M. A. A.; Aguiar, V. A. P.; Rallo, A.; Santos, R. B. B.; Medina, N. H.; Added, N.; Seixas, L. E., Jr.; Leite, F. G.; Cunha, F. G.; Cirne, K. H.; Giacomini, R.; de Oliveira, J. A.

    2015-07-01

    Recently, p-channel metal-oxide-semiconductor (pMOS) transistors were suggested as fit for the task of detecting and quantifying ionizing radiation dose. Linearity, small detection volume, fast readout, portability, low power consumption and low radiation attenuation are some of the pMOS advantages over PIN diode and thermoluminiscent dosimeters. A hand-held measurement system using a low power commercial off-the-shelf pMOSas the sensor would have a clear advantage due to the lower cost incurred by a standard technological process. In this research work, we tested the commercial device 3N163 regarding its behaviouras an X-ray sensor, as well as its possible application as a heavy-ion detector. To study the radiation effects of X-rays, a XRD-7000 (Shimadzu) X-ray diffraction setup was used to produce 10-keV effective energy photons. Heavy ions tests involved 12C, 16O, 19F, 28Si, 35Cl, 63Cu and 107Ag beams scattered at 15° by a 275 μg/cm2 gold target, which provide LETs (Linear Energy Transfer) from 4 to 40 MeV/mg/cm2. The signal readout was done using a 1 GHz oscilloscope with a 10-Gsamples/s conversion rate, high enough to permit the recording of transient pulses in the drain current. In this case, an ion can cause a current signal proportional to the ion beam used. Through this study it was found that a simple commercial pMOS device can be reliably used as a detector of X-rays as well as heavy ion detector.

  9. Temperature-dependent transport and hysteretic behaviors induced by interfacial states in MoS2 field-effect transistors with lead-zirconate-titanate ferroelectric gating

    NASA Astrophysics Data System (ADS)

    Sun, Yilin; Xie, Dan; Zhang, Xiaowen; Xu, Jianlong; Li, Xinming; Li, Xian; Dai, Ruixuan; Li, Xiao; Li, Peilian; Gao, Xingsen; Zhu, Hongwei

    2017-01-01

    We report the temperature and gate-voltage-dependent electrical properties of lead-zirconate-titanate-gated MoS2 field-effect transistors (MoS2-PZT FETs) within a temperature range of 300 to 380 K. The MoS2 transistors with PZT gating exhibit large reproducible clockwise hysteresis, which is induced by the dynamic charge-trapping/de-trapping process of interfacial states between PZT films and MoS2 channels under the modulation of ferroelectric polarization of PZT films. In this way, the modulation of the gate effect on the hysteresis behavior has been achieved by activating the dynamic charge-trapping/de-trapping process in the interfacial states under different V gs . Moreover, the temperature dependence of the current in the range of 300 to 380 K indicates thermally activated hysteretic behaviors. The hysteresis in the transfer characteristics of MoS2-PZT FETs shows a simultaneous enlargement with increasing temperature, which can be attributed to the thermally sensitive dynamic trapping/de-trapping process of interfacial states.

  10. Low Power Monolayer MoS2 Transistors for RF Applications

    DTIC Science & Technology

    2015-03-24

    nm gate length Lg devices. A new process has been developed for wafer scale MoS2 fabrication using sulfurization of ultra thin deposited Mo films...device development, a novel wafer scale process was developed in parallel using large area Mo deposition followed by sulfurization at high...SiO 2 /Si and Si 3 N 4 /Si substrates were prepared by the sulfurization of MoO 3 in alumina crucibles placed inside a quartz tube. The temperature

  11. Relation between degradation of electrical parameters of MOS transistors by hot carrier injection and their drift due to radiation for a new rad-hardened ACMOS technology

    NASA Astrophysics Data System (ADS)

    Frapreau, I.; Gagnard, X.

    2002-12-01

    Space environment induces degradations, which affect electrical performances of MOS transistors in satellites. It is very interesting to prevent such degradations, to be more competitive and to mainly satisfy customers in the best conditions. But the tests by ionizing radiations are long and expensive. That's why we would like to predict the effects of radiation by using tests with hot-carrier injection. Indeed the degradations induced with hot-carrier and radiations effects are similar. Oxide is damaged by charge trapping and interface states generation. Electrical parameters such as threshold voltage, linear current and transconductance are affected. Our study consists to find a correlation between the degradations of MOS transistors induced with hot-carrier and their damages due to gamma radiation environment.

  12. Effects of annealing on electrical performance of multilayer MoS2 transistors with atomic layer deposited HfO2 gate dielectric

    NASA Astrophysics Data System (ADS)

    Wen, Ming; Xu, Jingping; Liu, Lu; Lai, Pui-To; Tang, Wing-Man

    2016-09-01

    Atomic layer deposited HfO2 annealed in different ambients (N2, O2, and NH3) is used to replace SiO2 as a gate dielectric for fabricating back-gated multilayer MoS2 transistors. Excellent electrical properties such as a mobility of 15.1 cm2/(V·s), an on/off ratio exceeding 107, and a hysteresis of 0.133 V are achieved for samples annealed in NH3 at 400 °C for 10 min. This is caused by the NH3 annealing passivation effects that reduce defective states in the HfO2 dielectric and the interface. The capacitance equivalent thickness is only 7.85 nm, which is quite small for a back-gated MoS2 transistor and is conducive to the scaling down of the device.

  13. Permanent and Transient Radiation Effects on Thin-Oxide (200-A) MOS Transistors

    DTIC Science & Technology

    1976-06-01

    oxide devices after exposure to pulsed ionizing radiation showed improved performance over that of thick-oxide devices. It was found also that device...drain current versus gate voltage of 9.3pam channel length transistor both before and at various times after an ionizing electron pulse ...14 8 Annealing of threshold voltage shift at various times after an ionizing electron pulse

  14. Laser direct writing and inkjet printing for a sub-2 μm channel length MoS2 transistor with high-resolution electrodes

    NASA Astrophysics Data System (ADS)

    Kwon, Hyuk-Jun; Chung, Seungjun; Jang, Jaewon; Grigoropoulos, Costas P.

    2016-10-01

    Patterns formed by the laser direct writing (LDW) lithography process are used either as channels or barriers for MoS2 transistors fabricated via inkjet printing. Silver (Ag) nanoparticle ink is printed over patterns formed on top of the MoS2 flakes in order to construct high-resolution source/drain (S/D) electrodes. When positive photoresist is used, the produced grooves are filled with inkjetted Ag ink by capillary forces. On the other hand, in the case of negative photoresist, convex barrier-like patterns are written on the MoS2 flakes and patterns, dividing the printed Ag ink into the S/D electrodes by self-alignment. LDW lithography combined with inkjet printing is applied to MoS2 thin-film transistors that exhibit moderate electrical performance such as mobility and subthreshold swing. However, especially in the linear operation regime, their features are limited by the contact effect. The Y-function method can exclude the contact effect and allow proper evaluation of the maximum available mobility and contact resistance. The presented fabrication methods may facilitate the development of cost-effective fabrication processes.

  15. Fabrication and transfer of flexible few-layers MoS2 thin film transistors to any arbitrary substrate.

    PubMed

    Salvatore, Giovanni A; Münzenrieder, Niko; Barraud, Clément; Petti, Luisa; Zysset, Christoph; Büthe, Lars; Ensslin, Klaus; Tröster, Gerhard

    2013-10-22

    Recently, transition metal dichalcogenides (TMDCs) have attracted interest thanks to their large field effective mobility (>100 cm(2)/V · s), sizable band gap (around 1-2 eV), and mechanical properties, which make them suitable for high performance and flexible electronics. In this paper, we present a process scheme enabling the fabrication and transfer of few-layers MoS2 thin film transistors from a silicon template to any arbitrary organic or inorganic and flexible or rigid substrate or support. The two-dimensional semiconductor is mechanically exfoliated from a bulk crystal on a silicon/polyvinyl alcohol (PVA)/polymethyl methacrylane (PMMA) stack optimized to ensure high contrast for the identification of subnanometer thick flakes. Thin film transistors (TFTs) with structured source/drain and gate electrodes are fabricated following a designed procedure including steps of UV lithography, wet etching, and atomic layer deposited (ALD) dielectric. Successively, after the dissolution of the PVA sacrificial layer in water, the PMMA film, with the devices on top, can be transferred to another substrate of choice. Here, we transferred the devices on a polyimide plastic foil and studied the performance when tensile strain is applied parallel to the TFT channel. We measured an electron field effective mobility of 19 cm(2)/(V s), an I(on)/I(off)ratio greater than 10(6), a gate leakage current as low as 0.3 pA/μm, and a subthreshold swing of about 250 mV/dec. The devices continue to work when bent to a radius of 5 mm and after 10 consecutive bending cycles. The proposed fabrication strategy can be extended to any kind of 2D materials and enable the realization of electronic circuits and optical devices easily transferrable to any other support.

  16. Magneto-modulation of gate leakage current in 65 nm nMOS transistors: Experimental, modeling, and simulation results

    NASA Astrophysics Data System (ADS)

    Gutierrez-D, E. A.; Molina-R, J.; Garcia-R, P.; Martinez-C, J.; Guarin, F.

    2010-09-01

    We introduce experimental results that reveal a small static and a slowly varying-dynamic magnetic field B induces a magneto-modulation of the gate leakage current of a 65 nm nMOSFET. For the case of a 100 mT (mili-Tesla) static B field a variation of the 6% (1.5 nA/27 nA) of the gate current is observed. For a 5 Hz slowly varying (±100 mT) square pulsed magnetic field, the gate current dynamic variation raises up to 18% (4.8 nA/27 nA). These experimental observations are explained in terms of space and time modulation of the two-dimensional surface inversion layer charge. The static B field dependent model is validated through Minimos-NT numerical simulations, while the dynamic B field experimental observations are reproduced with a SPICE macro-model, which uses the static device model as initial condition for the dynamic model. With this model we are able to predict the impact of small static and dynamic B fields on the gate leakage current and channel current interference of low-dimensional MOS transistors. We also propose this electro-magnetic experimental technique as an alternative for detailed exploration of the Si-SiO 2 interface properties for 2 nm or thinner gate oxides, as well as for low-dimensional semiconductor devices.

  17. Lifetime studies of 130nm nMOS transistors intended for long-duration, cryogenic high-energy physics experiments.

    SciTech Connect

    Hoff, J.R.; Arora, R.; Cressler, J.D.; Deptuch, G.W.; Gui, P.; Lourenco, N.E.; Wu, G.; Yarema, R.J.; /Fermilab

    2011-12-01

    Future neutrino physics experiments intend to use unprecedented volumes of liquid argon to fill a time projection chamber in an underground facility. To increase performance, integrated readout electronics should work inside the cryostat. Due to the scale and cost associated with evacuating and filling the cryostat, the electronics will be unserviceable for the duration of the experiment. Therefore, the lifetimes of these circuits must be well in excess of 20 years. The principle mechanism for lifetime degradation of MOSFET devices and circuits operating at cryogenic temperatures is via hot carrier degradation. Choosing a process technology that is, as much as possible, immune to such degradation and developing design techniques to avoid exposure to such damage are the goals. This requires careful investigation and a basic understanding of the mechanisms that underlie hot carrier degradation and the secondary effects they cause in circuits. In this work, commercially available 130nm nMOS transistors operating at cryogenic temperatures are investigated. The results show that the difference in lifetime for room temperature operation and cryogenic operation for this process are not great and the lifetimes at both 300K and at 77K can be projected to more than 20 years at the nominal voltage (1.5V) for this technology.

  18. Novel reverse conducting insulated gate bipolar transistor with anti-parallel MOS controlled thyristor

    NASA Astrophysics Data System (ADS)

    Liheng, Zhu; Xingbi, Chen

    2014-07-01

    Novel reverse-conducting IGBT (RC-IGBT) with anti-parallel MOS controlled thyristor (MCT) is proposed. Its major feature is the introduction of an automatically controlled MCT at the anode, by which the anode-short effect is eliminated and the voltage snapback problem is solved. Furthermore, the snapback-free characteristics can be realized in novel RC-IGBT by a single cell with a width of 10 μm with more uniform current distribution. As numerical simulations show, compared with the conventional RC-IGBT, the forward conduction voltage is reduced by 35% while the reverse conduction voltage is reduced by 50% at J = 150 A/cm2.

  19. Symmetric complementary logic inverter using integrated black phosphorus and MoS2 transistors

    NASA Astrophysics Data System (ADS)

    Su, Yang; Kshirsagar, Chaitanya U.; Robbins, Matthew C.; Haratipour, Nazila; Koester, Steven J.

    2016-03-01

    The operation of an integrated two-dimensional complementary metal-oxide-semiconductor inverter with well-matched input/output voltages is reported. The circuit combines a few-layer MoS2 n-MOSFET and a black phosphorus (BP) p-MOSFET fabricated using a common local backgate electrode with thin (20 nm) HfO2 gate dielectric. The constituent devices have linear threshold voltages of -0.8 V and +0.8 V and produce peak transconductances of 16 μS μm-1 and 41 μS μm-1 for the MoS2 n-MOSFET and BP p-MOSFET, respectively. The inverter shows a voltage gain of 3.5 at a supply voltage, V DD = 2.5 V, and has peak switching current of 108 μA and off-state current of 8.4 μA (2.4 μA) at V IN = 0 (V IN = 2.5 V). In addition, the inverter has voltage gain greater than unity for V DD ≥ 0.5 V, has open butterfly curves for V DD ≥ 1 V, and achieves static noise margin over 500 mV at V DD = 2.5 V. The voltage gain was found to be insensitive to temperature between 270 and 340 K, and AC large and small-signal operation was demonstrated at frequencies up to 100 kHz. The demonstration of a complementary 2D inverter which operates in a symmetric voltage window suitable for driving a subsequent logic stage is a significant step forward in developing practical applications for devices based upon 2D materials.

  20. Laser direct writing and inkjet printing for a sub-2 μm channel length MoS2 transistor with high-resolution electrodes.

    PubMed

    Kwon, Hyuk-Jun; Chung, Seungjun; Jang, Jaewon; Grigoropoulos, Costas P

    2016-10-07

    Patterns formed by the laser direct writing (LDW) lithography process are used either as channels or barriers for MoS2 transistors fabricated via inkjet printing. Silver (Ag) nanoparticle ink is printed over patterns formed on top of the MoS2 flakes in order to construct high-resolution source/drain (S/D) electrodes. When positive photoresist is used, the produced grooves are filled with inkjetted Ag ink by capillary forces. On the other hand, in the case of negative photoresist, convex barrier-like patterns are written on the MoS2 flakes and patterns, dividing the printed Ag ink into the S/D electrodes by self-alignment. LDW lithography combined with inkjet printing is applied to MoS2 thin-film transistors that exhibit moderate electrical performance such as mobility and subthreshold swing. However, especially in the linear operation regime, their features are limited by the contact effect. The Y-function method can exclude the contact effect and allow proper evaluation of the maximum available mobility and contact resistance. The presented fabrication methods may facilitate the development of cost-effective fabrication processes.

  1. Engineering Chemically Active Defects in Monolayer MoS2 Transistors via Ion-Beam Irradiation and Their Healing via Vapor Deposition of Alkanethiols.

    PubMed

    Bertolazzi, Simone; Bonacchi, Sara; Nan, Guangjun; Pershin, Anton; Beljonne, David; Samorì, Paolo

    2017-03-01

    Irradiation of 2D sheets of transition metal dichalcogenides with ion beams has emerged as an effective approach to engineer chemically active defects in 2D materials. In this context, argon-ion bombardment has been utilized to introduce sulfur vacancies in monolayer molybdenum disulfide (MoS2 ). However, a detailed understanding of the effects of generated defects on the functional properties of 2D MoS2 is still lacking. In this work, the correlation between critical electronic device parameters and the density of sulfur vacancies is systematically investigated through the fabrication and characterization of back-gated monolayer MoS2 field-effect transistors (FETs) exposed to a variable fluence of low-energy argon ions. The electrical properties of pristine and ion-irradiated FETs can be largely improved/recovered by exposing the devices to vapors of short linear thiolated molecules. Such a solvent-free chemical treatment-carried out strictly under inert atmosphere-rules out secondary healing effects induced by oxygen or oxygen-containing molecules. The results provide a guideline to design monolayer MoS2 optoelectronic devices with a controlled density of sulfur vacancies, which can be further exploited to introduce ad hoc molecular functionalities by means of thiol chemistry approaches.

  2. Observation of abnormal mobility enhancement in multilayer MoS2 transistor by synergy of ultraviolet illumination and ozone plasma treatment

    NASA Astrophysics Data System (ADS)

    Guo, Junjie; Yang, Bingchu; Zheng, Zhouming; Jiang, Jie

    2017-03-01

    Mobility engineering through physical or chemical process is a fruitful approach for the atomically-layered two-dimensional electronic applications. Unfortunately, the usual process with either illumination or oxygen treatment would greatly deteriorate the mobility in two-dimensional MoS2 field-effect transistor (FET). Here, in this work, we report that the mobility can be abnormally enhanced to an order of magnitude by the synergy of ultraviolet illumination (UV) and ozone plasma treatment in multilayer MoS2 FET. This abnormal mobility enhancement is attributed to the trap passivation due to the photo-generated excess carriers during UV/ozone plasma treatment. An energy band model based on Schottky barrier modulation is proposed to understand the underlying mechanism. Raman spectra results indicate that the oxygen ions are incorporated into the surface of MoS2 (some of them are in the form of ultra-thin Mo-oxide) and can further confirm this proposed mechanism. Our results can thus provide a simple approach for mobility engineering in MoS2-based FET and can be easily expanded to other 2D electronic devices, which represents a significant step toward applications of 2D layered materials in advanced cost-effective electronics.

  3. Enhancement mode AlGaN/GaN MOS high-electron-mobility transistors with ZrO2 gate dielectric deposited by atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Anderson, Travis J.; Wheeler, Virginia D.; Shahin, David I.; Tadjer, Marko J.; Koehler, Andrew D.; Hobart, Karl D.; Christou, Aris; Kub, Francis J.; Eddy, Charles R., Jr.

    2016-07-01

    Advanced applications of AlGaN/GaN high-electron-mobility transistors (HEMTs) in high-power RF and power switching are driving the need for insulated gate technology. We present a metal-oxide-semiconductor (MOS) gate structure using atomic-layer-deposited ZrO2 as a high-k, high-breakdown gate dielectric for reduced gate leakage and a recessed barrier structure for enhancement mode operation. Compared to a Schottky metal-gate HEMT, the recessed MOS-HEMT structure demonstrated a reduction in the gate leakage current by 4 orders of magnitude and a threshold voltage shift of +6 V to a record +3.99 V, enabled by a combination of a recessed barrier structure and negative oxide charge.

  4. Two-dimensional low-resistance contacts for high performance WSe2 and MoS2 transistors

    NASA Astrophysics Data System (ADS)

    Chuang, Hsun-Jen

    Two-dimensional layered materials beyond graphene such as transition metal dichalcogenides (TMDs) have attracted a lot of interests due to their superior property in many aspects. In this work, I am focusing on two TMD materials: WSe2 and MoS2. The main objective this work is to develop novel approaches to fabricating low-resistance ohmic contacts to TMDs for low power, high performance electronic applications. First, we used graphene as electrical contacts for WSe2 field-effect transistor with superior performance, including a high ON/OFF ratio of >107 at 170 K, large electron mobility of 330 cm2V-1s -1 and he hole mobility of 270 cm2V-1s -1 at 77 K, and low contact resistance of 2kΩ microm. Second, we developed a novel 2D to 2D contacts strategy2 for a variety of TMDs by van der Waals assembly of substitutionally doped TMDs as drain/source contacts and TMDs with no intentional doping as channel materials. The high intrinsic behavior of the device is revealed, where it exhibits low contact resistances of 0.3 kΩ microm, on/off ratios up to > 109 as well as two-terminal field-effect hole mobility muFE ≈ 2x102 cm2 V-1 s -1 at 300K, which increases to > 6x103 cm 2 V-1 s-1 down to 10K. The 2D/2D low-resistance ohmic contacts presented here represent a new device paradigm that overcomes a significant bottleneck in the performance of TMDs and other 2D materials as the channel materials in post-silicon electronic.

  5. Laser Direct Writing Process for Making Electrodes and High-k Sol-Gel ZrO2 for Boosting Performances of MoS2 Transistors.

    PubMed

    Kwon, Hyuk-Jun; Jang, Jaewon; Grigoropoulos, Costas P

    2016-04-13

    A series of two-dimensional (2D) transition metal dichalcogenides (TMDCs), including molybdenum disulfide (MoS2), can be attractive materials for photonic and electronic applications due to their exceptional properties. Among these unique properties, high mobility of 2D TMDCs enables realization of high-performance nanoelectronics based on a thin film transistor (TFT) platform. In this contribution, we report highly enhanced field effect mobility (μ(eff) = 50.1 cm(2)/(V s), ∼2.5 times) of MoS2 TFTs through the sol-gel processed high-k ZrO2 (∼22.0) insulator, compared to those of typical MoS2/SiO2/Si structures (μ(eff) = 19.4 cm(2)/(V s)) because a high-k dielectric layer can suppress Coulomb electron scattering and reduce interface trap concentration. Additionally, in order to avoid costly conventional mask based photolithography and define the patterns, we employ a simple laser direct writing (LDW) process. This process allows precise and flexible control with reasonable resolution (up to ∼10 nm), depending on the system, and enables fabrication of arbitrarily patterned devices. Taking advantage of continuing developments in laser technology offers a substantial cost decrease, and LDW may emerge as a promising technology.

  6. Evaluation des performances du transistor MOS de puissance sur carbure de silicium. Compromis résistance passante, tenue en tension et vitesse de commutation

    NASA Astrophysics Data System (ADS)

    Beydoun, B.; Rossel, P.; Tranduc, H.; Charitat, G.

    1994-08-01

    The DC trade-off " ON resistance versus voltage capability " is determined for the SiC multicellular Power MOSFET transistor. First, this limit is analytically calculated for the bulk material. Then, the influence of the size of the MOSFET cell is considered. Under dynamic condition, the switching behaviour is simulated and analysed. We confirm that the DC performances of the SiC device are better than those of Si structures. From a dynamic point of view, a degradation can or not occur depending upon the voltage capability of the considered device. The degradation is due to the drain-gate Miller capacitance increase with the drain doping value. On détermine le compromis statique "résistance passante — tenue en tension" des transistors MOS de puissance multicellulaires sur carbure de silicium. Cette limite est d'abord calculée analytiquement pour le matériau volumique. L'influence de la taille des cellules du transistor MOS est ensuite prise en compte. Au niveau dynamique, la commutation résistive est également simulée. On confirme que les performances statiques de composants SiC sont potentiellement meilleures que celles de leurs homologues Si. D'un point de vue dynamique, on montre que selon la tenue en tension considérée, une dégradation du temps de commutation peut ou non apparaître. Celle-ci est expliquée par l'accroissement de la capacité drain-grille corrélative à l'augmentation de dopage.

  7. Electrical characterization of electron beam induced damage on sub-10 nm n-channel MOS transistors using nano-probing technique

    NASA Astrophysics Data System (ADS)

    Kang, Jonghyuk; Lee, Sungho; Choi, Byoungdeog

    2016-11-01

    Electron beam induced damage on sub-10 nm n-channel MOS transistors was evaluated using an atomic force microscopy-based nano-probing technique. After electron beam irradiation, all the device parameters shifted including threshold voltage (V th), saturation current, sub-threshold slope and transistor leakage current. A negative shift in V th occurred at low electron beam acceleration voltage (V acc) because of the increase in oxide trapped holes generated by excited plasmons. At high V acc, however, a positive V th shift was observed because of an increased contribution of interface trap generation caused by the deeper electron penetration depth. In addition, interface trap generation not only degraded the sub-threshold slope due to the additional capacitance from the generated interface traps, but also increased transistor leakage current due to changes in junction characteristics. Our studies show that it is critical to avoid electron beam exposure before electrical characterization on sub-10 nm devices even in the range of less than 1.0 kV of V acc using nano-probe systems.

  8. Electronic properties of MoS2 / MoOx interfaces: Implications in Tunnel Field Effect Transistors and Hole Contacts

    DOE PAGES

    Santosh, K. C.; Longo, Roberto; Addou, Rafik; ...

    2016-09-26

    In an electronic device based on two dimensional (2D) transitional metal dichalcogenides (TMDs), finding a low resistance metal contact is critical in order to achieve the desired performance. However, due to the unusual Fermi level pinning in metal/2D TMD interface, the performance is limited. Here, we investigate the electronic properties of TMDs and transition metal oxide (TMO) interfaces (MoS2/MoO3) using density functional theory (DFT). Our results demonstrate that, due to the large work function of MoO3 and the relative band alignment with MoS2, together with small energy gap, the MoS2/MoO3 interface is a good candidate for a tunnel field effectmore » (TFET)-type device. Moreover, if the interface is not stoichiometric because of the presence of oxygen vacancies in MoO3, the heterostructure is more suitable for p-type (hole) contacts, exhibiting an Ohmic electrical behavior as experimentally demonstrated for different TMO/TMD interfaces. Our results reveal that the defect state induced by an oxygen vacancy in the MoO3 aligns with the valance band of MoS2, showing an insignificant impact on the band gap of the TMD. This result highlights the role of oxygen vacancies in oxides on facilitating appropriate contacts at the MoS2 and MoOx (x < 3) interface, which consistently explains the available experimental observations.« less

  9. Electronic properties of MoS2/MoOx interfaces: Implications in Tunnel Field Effect Transistors and Hole Contacts.

    PubMed

    K C, Santosh; Longo, Roberto C; Addou, Rafik; Wallace, Robert M; Cho, Kyeongjae

    2016-09-26

    In an electronic device based on two dimensional (2D) transitional metal dichalcogenides (TMDs), finding a low resistance metal contact is critical in order to achieve the desired performance. However, due to the unusual Fermi level pinning in metal/2D TMD interface, the performance is limited. Here, we investigate the electronic properties of TMDs and transition metal oxide (TMO) interfaces (MoS2/MoO3) using density functional theory (DFT). Our results demonstrate that, due to the large work function of MoO3 and the relative band alignment with MoS2, together with small energy gap, the MoS2/MoO3 interface is a good candidate for a tunnel field effect (TFET)-type device. Moreover, if the interface is not stoichiometric because of the presence of oxygen vacancies in MoO3, the heterostructure is more suitable for p-type (hole) contacts, exhibiting an Ohmic electrical behavior as experimentally demonstrated for different TMO/TMD interfaces. Our results reveal that the defect state induced by an oxygen vacancy in the MoO3 aligns with the valance band of MoS2, showing an insignificant impact on the band gap of the TMD. This result highlights the role of oxygen vacancies in oxides on facilitating appropriate contacts at the MoS2 and MoOx (x < 3) interface, which consistently explains the available experimental observations.

  10. Electronic properties of MoS2/MoOx interfaces: Implications in Tunnel Field Effect Transistors and Hole Contacts

    NASA Astrophysics Data System (ADS)

    K. C., Santosh; Longo, Roberto C.; Addou, Rafik; Wallace, Robert M.; Cho, Kyeongjae

    2016-09-01

    In an electronic device based on two dimensional (2D) transitional metal dichalcogenides (TMDs), finding a low resistance metal contact is critical in order to achieve the desired performance. However, due to the unusual Fermi level pinning in metal/2D TMD interface, the performance is limited. Here, we investigate the electronic properties of TMDs and transition metal oxide (TMO) interfaces (MoS2/MoO3) using density functional theory (DFT). Our results demonstrate that, due to the large work function of MoO3 and the relative band alignment with MoS2, together with small energy gap, the MoS2/MoO3 interface is a good candidate for a tunnel field effect (TFET)-type device. Moreover, if the interface is not stoichiometric because of the presence of oxygen vacancies in MoO3, the heterostructure is more suitable for p-type (hole) contacts, exhibiting an Ohmic electrical behavior as experimentally demonstrated for different TMO/TMD interfaces. Our results reveal that the defect state induced by an oxygen vacancy in the MoO3 aligns with the valance band of MoS2, showing an insignificant impact on the band gap of the TMD. This result highlights the role of oxygen vacancies in oxides on facilitating appropriate contacts at the MoS2 and MoOx (x < 3) interface, which consistently explains the available experimental observations.

  11. Electronic properties of MoS2/MoOx interfaces: Implications in Tunnel Field Effect Transistors and Hole Contacts

    PubMed Central

    K. C., Santosh; Longo, Roberto C.; Addou, Rafik; Wallace, Robert M.; Cho, Kyeongjae

    2016-01-01

    In an electronic device based on two dimensional (2D) transitional metal dichalcogenides (TMDs), finding a low resistance metal contact is critical in order to achieve the desired performance. However, due to the unusual Fermi level pinning in metal/2D TMD interface, the performance is limited. Here, we investigate the electronic properties of TMDs and transition metal oxide (TMO) interfaces (MoS2/MoO3) using density functional theory (DFT). Our results demonstrate that, due to the large work function of MoO3 and the relative band alignment with MoS2, together with small energy gap, the MoS2/MoO3 interface is a good candidate for a tunnel field effect (TFET)-type device. Moreover, if the interface is not stoichiometric because of the presence of oxygen vacancies in MoO3, the heterostructure is more suitable for p-type (hole) contacts, exhibiting an Ohmic electrical behavior as experimentally demonstrated for different TMO/TMD interfaces. Our results reveal that the defect state induced by an oxygen vacancy in the MoO3 aligns with the valance band of MoS2, showing an insignificant impact on the band gap of the TMD. This result highlights the role of oxygen vacancies in oxides on facilitating appropriate contacts at the MoS2 and MoOx (x < 3) interface, which consistently explains the available experimental observations. PMID:27666523

  12. Theory and experiments of electron-hole recombination at silicon/silicon dioxide interface traps and tunneling in thin oxide MOS transistors

    NASA Astrophysics Data System (ADS)

    Cai, Jin

    2000-10-01

    Surface recombination and channel have dominated the electrical characteristics, performance and reliability of p/n junction diodes and transistors. This dissertation uses a sensitive direct-current current voltage (DCIV) method to measure base terminal currents (IB) modulated by the gate bias (VGB) and forward p/n junction bias (VPN) in a MOS transistor (MOST). Base terminal currents originate from electron-hole recombination at Si/SiO2 interface traps. Fundamental theories which relate DCIV characteristics to device and material parameters are presented. Three theory-based applications are demonstrated on both the unstressed as well as hot-carrier-stressed MOSTs: (1) determination of interface trap density and energy levels, (2) spatial profile of interface traps in the drain/base junction-space-charge region and in the channel region, and (3) determination of gate oxide thickness and impurity doping concentrations. The results show that interface trap energy levels are discrete, which is consistent with those from silicon dangling bonds; in unstressed MOS transistors interface trap density in the channel region rises sharply toward source and drain, and after channel-hot-carrier stress, interface trap density increases mostly in the junction space-charge region. As the gate oxide thins below 3 nm, the gate oxide leakage current via quantum mechanical tunneling becomes significant. A gate oxide tunneling theory which refined the traditional WKB tunneling probability is developed for modeling tunneling currents at low electric fields through a trapezoidal SiO2 barrier. Correlation with experimental data on thin oxide MOSTs reveals two new results: (1) hole tunneling dominates over electron tunneling in p+gate p-channel MOSTs, and (2) the small gate/drain overlap region passes higher tunneling currents than the channel region under depletion to flatband gate voltages. The good theory-experimental correlation enables the extraction of impurity doping concentrations

  13. Charge transport in ion-gated mono-, bi-, and trilayer MoS2 field effect transistors

    PubMed Central

    Chu, Leiqiang; Schmidt, Hennrik; Pu, Jiang; Wang, Shunfeng; Özyilmaz, Barbaros; Takenobu, Taishi; Eda, Goki

    2014-01-01

    Charge transport in MoS2 in the low carrier density regime is dominated by trap states and band edge disorder. The intrinsic transport properties of MoS2 emerge in the high density regime where conduction occurs via extended states. Here, we investigate the transport properties of mechanically exfoliated mono-, bi-, and trilayer MoS2 sheets over a wide range of carrier densities realized by a combination of ion gel top gate and SiO2 back gate, which allows us to achieve high charge carrier (>1013 cm−2) densities. We discuss the gating properties of the devices as a function of layer thickness and demonstrate resistivities as low as 1 kΩ for monolayer and 420 Ω for bilayer devices at 10 K. We show that from the capacitive coupling of the two gates, quantum capacitance can be roughly estimated to be on the order of 1 μF/cm2 for all devices studied. The temperature dependence of the carrier mobility in the high density regime indicates that short-range scatterers limit charge transport at low temperatures. PMID:25465059

  14. High-performance enhancement-mode Al2O3/InAlGaN/GaN MOS high-electron mobility transistors with a self-aligned gate recessing technology

    NASA Astrophysics Data System (ADS)

    Zhang, Kai; Kong, Cen; Zhou, Jianjun; Kong, Yuechan; Chen, Tangsheng

    2017-02-01

    The paper reports high-performance enhancement-mode MOS high-electron mobility transistors (MOS-HEMTs) based on a quaternary InAlGaN barrier. Self-aligned gate technology is used for gate recessing, dielectric deposition, and gate electrode formation. An improved digital recessing process is developed, and an Al2O3 gate dielectric grown with O2 plasma is used. Compared to results with AlGaN barrier, the fabricated E-mode MOS-HEMT with InAlGaN barrier delivers a record output current density of 1.7 A/mm with a threshold voltage (V TH) of 1.5 V, and a small on-resistance (R on) of 2.0 Ω·mm. Excellent V TH hysteresis and greatly improved gate leakage characteristics are also demonstrated.

  15. Junction-Structure-Dependent Schottky Barrier Inhomogeneity and Device Ideality of Monolayer MoS2 Field-Effect Transistors.

    PubMed

    Moon, Byoung Hee; Han, Gang Hee; Kim, Hyun; Choi, Homin; Bae, Jung Jun; Kim, Jaesu; Jin, Youngjo; Jeong, Hye Yun; Joo, Min-Kyu; Lee, Young Hee; Lim, Seong Chu

    2017-03-29

    Although monolayer transition metal dichalcogenides (TMDs) exhibit superior optical and electrical characteristics, their use in digital switching devices is limited by incomplete understanding of the metal contact. Comparative studies of Au top and edge contacts with monolayer MoS2 reveal a temperature-dependent ideality factor and Schottky barrier height (SBH). The latter originates from inhomogeneities in MoS2 caused by defects, charge puddles, and grain boundaries, which cause local variation in the work function at Au-MoS2 junctions and thus different activation temperatures for thermionic emission. However, the effect of inhomogeneities due to impurities on the SBH varies with the junction structure. The weak Au-MoS2 interaction in the top contact, which yields a higher SBH and ideality factor, is more affected by inhomogeneities than the strong interaction in the edge contact. Observed differences in the SBH and ideality factor in different junction structures clarify how the SBH and inhomogeneities can be controlled in devices containing TMD materials.

  16. Low-Resistance 2D/2D Ohmic Contacts: A Universal Approach to High-Performance WSe2, MoS2, and MoSe2 Transistors.

    PubMed

    Chuang, Hsun-Jen; Chamlagain, Bhim; Koehler, Michael; Perera, Meeghage Madusanka; Yan, Jiaqiang; Mandrus, David; Tománek, David; Zhou, Zhixian

    2016-03-09

    We report a new strategy for fabricating 2D/2D low-resistance ohmic contacts for a variety of transition metal dichalcogenides (TMDs) using van der Waals assembly of substitutionally doped TMDs as drain/source contacts and TMDs with no intentional doping as channel materials. We demonstrate that few-layer WSe2 field-effect transistors (FETs) with 2D/2D contacts exhibit low contact resistances of ∼0.3 kΩ μm, high on/off ratios up to >10(9), and high drive currents exceeding 320 μA μm(-1). These favorable characteristics are combined with a two-terminal field-effect hole mobility μFE ≈ 2 × 10(2) cm(2) V(-1) s(-1) at room temperature, which increases to >2 × 10(3) cm(2) V(-1) s(-1) at cryogenic temperatures. We observe a similar performance also in MoS2 and MoSe2 FETs with 2D/2D drain and source contacts. The 2D/2D low-resistance ohmic contacts presented here represent a new device paradigm that overcomes a significant bottleneck in the performance of TMDs and a wide variety of other 2D materials as the channel materials in postsilicon electronics.

  17. Low-resistance 2D/2D ohmic contacts: A universal approach to high-performance WSe2, MoS2, and MoSe2 transistors

    DOE PAGES

    Chuang, Hsun -Jen; Chamlagain, Bhim; Koehler, Michael; ...

    2016-02-04

    Here, we report a new strategy for fabricating 2D/2D low-resistance ohmic contacts for a variety of transition metal dichalcogenides (TMDs) using van der Waals assembly of substitutionally doped TMDs as drain/source contacts and TMDs with no intentional doping as channel materials. We demonstrate that few-layer WSe2 field-effect transistors (FETs) with 2D/2D contacts exhibit low contact resistances of ~0.3 kΩ μm, high on/off ratios up to >109, and high drive currents exceeding 320 μA μm–1. These favorable characteristics are combined with a two-terminal field-effect hole mobility μFE ≈ 2 × 102 cm2 V–1 s–1 at room temperature, which increases to >2more » × 103 cm2 V–1 s–1 at cryogenic temperatures. We observe a similar performance also in MoS2 and MoSe2 FETs with 2D/2D drain and source contacts. The 2D/2D low-resistance ohmic contacts presented here represent a new device paradigm that overcomes a significant bottleneck in the performance of TMDs and a wide variety of other 2D materials as the channel materials in postsilicon electronics.« less

  18. Work Function Tuning in Two-Dimensional MoS2 Field-Effect-Transistors with Graphene and Titanium Source-Drain Contacts

    PubMed Central

    Baik, Seung Su; Im, Seongil; Choi, Hyoung Joon

    2017-01-01

    Based on the first principles calculation, we investigate the electronic band structures of graphene-MoS2 and Ti-MoS2 heterojunctions under gate-voltages. By simultaneous control of external electric fields and carrier charging concentrations, we show that the graphene’s Dirac point position inside the MoS2 bandgap is easily modulated with respect to the co-varying Fermi level, while keeping the graphene’s linear band structure around the Dirac point. The easy modulation of graphene bands is not confined to the special cases where the conduction-band-minimum point of MoS2 and the Dirac point of graphene are matched up in reciprocal space, but is generalized to their dislocated cases. This flexibility caused by the strong decoupling between graphene and MoS2 bands enhances the gate-controlled switching performance in MoS2-graphene hybrid stacking-device. PMID:28358116

  19. Research Update: Nanoscale surface potential analysis of MoS2 field-effect transistors for biomolecular detection using Kelvin probe force microscopy

    NASA Astrophysics Data System (ADS)

    Kim, Min Hyung; Park, Heekyeong; Lee, Hyungbeen; Nam, Kihwan; Jeong, Seokhwan; Omkaram, Inturu; Yoon, Dae Sung; Lee, Sei Young; Kim, Sunkook; Lee, Sang Woo

    2016-10-01

    We used high-resolution Kelvin probe force microscopy (KPFM) to investigate the immobilization of a prostate specific antigen (PSA) antibody by measuring the surface potential (SP) on a MoS2 surface over an extensive concentration range (1 pg/ml-100 μg/ml). After PSA antibody immobilization, we demonstrated that the SP on the MoS2 surface characterized by KPFM strongly correlated to the electrical signal of a MoS2 bioFET. This demonstration can not only be used to optimize the immobilization conditions for captured molecules, but can also be applied as a diagnostic tool to complement the electrical detection of a MoS2 FET biosensor.

  20. Substrate dependence of Hall and Field-effect mobilities in few-layer MoS2 field-effect transistors

    NASA Astrophysics Data System (ADS)

    Chamlagain, Bhim; Perera, Meeghage; Chuang, Hsuen-Jen; Bowman, Arthur; Rijal, Upendra; Andrews, Kraig; Klesko, Joseph; Winter, Charles; Zhou, Zhixian

    In this work, we systematically study the Hall and field-effect mobilities of few-layer MoS2 FETs fabricated on different substrates. Hall bar devices were fabricated on SiO2 and hBN to directly measure carrier density. Standard four-probe transport measurement and Hall effect measurement were carried out for a wide temperature range to determine the carrier mobility and understand the scattering mechanisms. By comparing field-effect and Hall mobilities, we demonstrate that the intrinsic drift mobility of multiplayer MoS2 in the high carrier density metallic region is independent of substrate and sample thickness. While the optical-phonon scattering remains the dominant scattering mechanism in MoS2 devices on h-BN down to ~100 K, extrinsic scattering mechanisms start to degrade the carrier mobility of MoS2 on all other substrates below ~200 K. NSF Grant Number DMR-1308436.

  1. MOS integrated circuit fault modeling

    NASA Technical Reports Server (NTRS)

    Sievers, M.

    1985-01-01

    Three digital simulation techniques for MOS integrated circuit faults were examined. These techniques embody a hierarchy of complexity bracketing the range of simulation levels. The digital approaches are: transistor-level, connector-switch-attenuator level, and gate level. The advantages and disadvantages are discussed. Failure characteristics are also described.

  2. High quality PECVD SiO2 process for recessed MOS-gate of AlGaN/GaN-on-Si metal-oxide-semiconductor heterostructure field-effect transistors

    NASA Astrophysics Data System (ADS)

    Lee, Jae-Gil; Kim, Hyun-Seop; Seo, Kwang-Seok; Cho, Chun-Hyung; Cha, Ho-Young

    2016-08-01

    A high quality SiO2 deposition process using a plasma enhanced chemical vapor deposition system has been developed for the gate insulator process of normally-off recessed-gate AlGaN/GaN metal-oxide-semiconductor-heterostructure field-effect transistors (MOS-HFETs). SiO2 films were deposited by using SiH4 and N2O mixtures as reactant gases. The breakdown field increased with increasing the N2O flow rate. The optimum SiH4/N2O ratio was 0.05, which resulted in a maximum breakdown field of 11 MV/cm for the SiO2 film deposited on recessed GaN surface. The deposition conditions were optimized as follows; a gas flow rate of SiH4/N2O (=27/540 sccm), a source RF power of 100 W, a pressure of 2 Torr, and a deposition temperature of 350 °C. A fabricated normally-off MOS-HFET exhibited a threshold voltage of 3.2 V, a specific on-resistance of 4.46 mΩ cm2, and a breakdown voltage of 810 V.

  3. Negative differential resistance and effect of defects and deformations in MoS2 armchair nanoribbon metal-oxide-semiconductor field effect transistor

    NASA Astrophysics Data System (ADS)

    Sengupta, Amretashis; Mahapatra, Santanu

    2013-11-01

    In this work, we present a study on the negative differential resistance (NDR) behavior and the impact of various deformations (like ripple, twist, wrap) and defects like vacancies and edge roughness on the electronic properties of short-channel MoS2 armchair nanoribbon MOSFETs. The effect of deformation (3°-7° twist or wrap and 0.3-0.7 Å ripple amplitude) and defects on a 10 nm MoS2 ANR FET is evaluated by the density functional tight binding theory and the non-equilibrium Green`s function approach. We study the channel density of states, transmission spectra, and the ID-VD characteristics of such devices under the varying conditions, with focus on the NDR behavior. Our results show significant change in the NDR peak to valley ratio and the NDR window with such minor intrinsic deformations, especially with the ripple.

  4. Gyrator employing field effect transistors

    NASA Technical Reports Server (NTRS)

    Hochmair, E. S. (Inventor)

    1973-01-01

    A gyrator circuit of the conventional configuration of two amplifiers in a circular loop, one producing zero phase shift and the other producing 180 deg phase reversal is examined. All active elements are MOS field effect transistors. Each amplifier comprises a differential amplifier configuration with current limiting transistor, followed by an output transistor in cascode configuration, and two load transistors of opposite conductivity type from the other transistors. A voltage divider control circuit comprises a series string of transistors with a central voltage input to provide control, with locations on the amplifiers receiving reference voltages by connection to appropriate points on the divider. The circuit produces excellent response and is well suited for fabrication by integrated circuits.

  5. John Bardeen and transistor physics

    NASA Astrophysics Data System (ADS)

    Huff, Howard R.

    2001-01-01

    John Bardeen and Walter Brattain invented the point-contact semiconductor amplifier (transistor action) in polycrystalline germanium (also observed in polycrystalline silicon) on Dec. 15, 1947, for which they received a patent on Oct. 3, 1950. Bill Shockley was not a co-patent holder on Bardeen and Brattain's point-contact semiconductor amplifier patent since Julius Lilienfeld had already received a patent in 1930 for what would have been Shockley's contribution; namely, the field-effect methodology. Shockley received patents for both his minority-carrier injection concept and junction transistor theory, however, and deservedly shared the Nobel prize with Bardeen and Brattain for his seminal contributions of injection, p-n junction theory and junction transistor theory. We will review the events leading up to the invention of Bardeen and Brattain's point-contact semiconductor amplifier during the magic month of November 17-December 16, 1947 and the invention of Shockley's junction semiconductor amplifier during his magic month of December 24, 1947-January 23, 1948. It was during the course of Bardeen and Brattain's research in November, 1947 that Bardeen also patented the essence of the MOS transistor, wherein the induced minority carriers were confined to the inversion layer enroute to the collector. C. T. Sah has described this device as a sourceless MOS transistor. Indeed, John Bardeen, co-inventor of the point-contact semiconductor amplifier and inventor of the MOS transistor, may rightly be called the father of modern electronics.

  6. Schottky bipolar I-MOS: An I-MOS with Schottky electrodes and an open-base BJT configuration for reduced operating voltage

    NASA Astrophysics Data System (ADS)

    Kannan, N.; Kumar, M. Jagadesh

    2017-04-01

    In this paper, we have proposed a novel impact ionization MOS (I-MOS) structure, called the Schottky bipolar I-MOS, with Schottky source and drain electrodes and utilizing the open-base bipolar junction transistor (BJT) configuration for achieving reduction in the operating voltage of the I-MOS transistor. We report, using 2-D simulations, a low operating voltage (∼1.1 V) and a low subthreshold swing (∼3.6 mV/Decade). For the corresponding p-i-n I-MOS, the operating voltage is ∼5.5 V. The operating voltage of the Schottky bipolar I-MOS is the lowest reported operating voltage for silicon based I-MOS transistors. The nearly 80% reduction in the operating voltage of the Schottky bipolar I-MOS makes it suitable for applications requiring low operating voltages. The Schottky bipolar I-MOS is also expected to have an improved reliability over the p-i-n I-MOS since high energy carriers, induced by impact ionization near the drain, do not have to pass under the gate region in the channel. The use of Schottky contacts instead of heavily doped source and drain regions and the low channel doping level reduces the required thermal budget for device fabrication. The low operating voltage, low subthreshold swing and possibly improved reliability of the Schottky bipolar I-MOS, makes it a potential solution for applications where steep subthreshold slope transistors are being explored as alternative to the conventional MOS transistor.

  7. Chemical Vapor Sensing with Monolayer MoS2

    DTIC Science & Technology

    2013-01-04

    much higher selectivity than carbon nanotube-based sensors. KEYWORDS: Chemical sensor, MoS2, molybdenum disulfide, two-dimensional materials, vapor...such single or few monolayer materials enables highly efficient gating of charge transport via surface gates, obviating the need for the more complex ...photoresponse.7−9 Very recent work has demonstrated fabrication of complex integrated logic circuits based on bilayer MoS2 transistors, 10 and significant

  8. SWNT array resonant gate MOS transistor.

    PubMed

    Arun, A; Campidelli, S; Filoramo, A; Derycke, V; Salet, P; Ionescu, A M; Goffman, M F

    2011-02-04

    We show that thin horizontal arrays of single wall carbon nanotubes (SWNTs) suspended above the channel of silicon MOSFETs can be used as vibrating gate electrodes. This new class of nano-electromechanical system (NEMS) combines the unique mechanical and electronic properties of SWNTs with an integrated silicon-based motion detection. Its electrical response exhibits a clear signature of the mechanical resonance of SWNT arrays (120-150 MHz) showing that these thin horizontal arrays behave as a cohesive, rigid and elastic body membrane with a Young's modulus in the order of 1-10 GPa and ultra-low mass. The resonant frequency can be tuned by the gate voltage and its dependence is well understood within the continuum mechanics framework.

  9. MoS2 Surface Structure Tailoring via Carbonaceous Promoter

    PubMed Central

    Shi, Yumeng; Li, Henan; Wong, Jen It; Zhang, Xiaoting; Wang, Ye; Song, Huaihe; Yang, Hui Ying

    2015-01-01

    Atomically thin semiconducting transition-metal dichalcogenides have been attracting lots of attentions, particularly, molybdenum disulfide (MoS2) monolayers show promising applications in field effect transistors, optoelectronics and valleytronics. However, the controlled synthesis of highly crystalline MoS2 remain a challenge especially the systematic approach to manipulate its structure and morphology. Herein, we report a method for controlled synthesis of highly crystalline MoS2 by using chemical vapor deposition method with carbonaceous materials as growth promoter. A uniform and highly crystalline MoS2 monolayer with the grain size close to 40 μm was achieved. Furthermore, we extend the method to the manipulation of MoS2 morphology, flower-shape vertical grown MoS2 layers were obtained on growth promoting substrates. This simple approach allows an easy access of highly crystalline MoS2 layers with morphology tuned in a controllable manner. Moreover, the flower-shape MoS2 grown on graphene oxide film used as an anode material for lithium-ion batteries showed excellent electrochemical performance. PMID:25994238

  10. Controllable Schottky Barriers between MoS2 and Permalloy

    PubMed Central

    Wang, Weiyi; Liu, Yanwen; Tang, Lei; Jin, Yibo; Zhao, Tongtong; Xiu, Faxian

    2014-01-01

    MoS2 is a layered two-dimensional material with strong spin-orbit coupling and long spin lifetime, which is promising for electronic and spintronic applications. However, because of its large band gap and small electron affinity, a considerable Schottky barrier exists between MoS2 and contact metal, hindering the further study of spin transport and spin injection in MoS2. Although substantial progress has been made in improving device performance, the existence of metal-semiconductor Schottky barrier has not yet been fully understood. Here, we investigate permalloy (Py) contacts to both multilayer and monolayer MoS2. Ohmic contact is developed between multilayer MoS2 and Py electrodes with a negative Schottky barrier, which yields a high field-effect mobility exceeding 55 cm2V−1s−1 at low temperature. Further, by applying back gate voltage and inserting different thickness of Al2O3 layer between the metal and monolayer MoS2, we have achieved a good tunability of the Schottky barrier height (down to zero). These results are important in improving the performance of MoS2 transistor devices; and it may pave the way to realize spin transport and spin injection in MoS2. PMID:25370911

  11. Reducing Sodium Contamination in MOS Devices

    NASA Technical Reports Server (NTRS)

    Dehaye, R. F.; Feltner, W. R.

    1986-01-01

    Method of removing positive ions from oxides in metal-oxide-semiconductor (MOS) transistors and intergrated circuits ensure freedom from contamination by sodium and other mobile positive ions. Electric field applied during oxide growth to push mobile Na + ions to surface. After cooling from growth temperature, field turned off and Na + contaminated surface layer etched away. New method intended to suplement established methods of minimizing ion contamination, such as scrupulous cleanliness in processing, purging with hydrogen chloride to react with and remove contaminants, and growing extra-thick gate oxide, then etching it to remove large portion of contaminants concentrated near surface.

  12. Tuning the hysteresis voltage in 2D multilayer MoS2 FETs

    NASA Astrophysics Data System (ADS)

    Jiang, Jie; Zheng, Zhouming; Guo, Junjie

    2016-10-01

    The hysteresis tuning is of great significance before the two-dimensional (2D) molybdenum disulfide (MoS2) field-effect transistors (FETs) can be practically used in the next-generation nanoelectronic devices. In this paper, a simple and effective annealing method was developed to tune the hysteresis voltage in 2D MoS2 transistors. It was found that high temperature (175 °C) annealing in air could increase the hysteresis voltage from 8.0 V (original device) to 28.4 V, while a next vacuum annealing would reduce the hysteresis voltage to be only 2.0 V. An energyband diagram model based on electron trapping/detrapping due to oxygen adsorption is proposed to understand the hysteresis mechanism in multilayer MoS2 FET. This simple method for tuning the hysteresis voltage of MoS2 FET can make a significant step toward 2D nanoelectronic device applications.

  13. Macromodeling and optimization of digital MOS VLSI circuits

    NASA Astrophysics Data System (ADS)

    Matson, M. D.; Glasser, L. A.

    1986-03-01

    Power consumption and signal delay are crucial to the design of high-performance VLSI circuits. This paper presents CAD tools for modeling and optimizing digital MOS designs. The tools determine the transistor sizes that minimize circuit power consumption subject to constraints on signal path delays. Computational efficiency is obtained through macromodeling techniques and a specialized optimization algorithm. The macromodels are based on device equations, and encapsulate logic gate behavior in a set of simple yet accurate formulas. The optimization algorithm exploits properties of the digital MOS domain to convert the primal optimization problem into a dual form which is much easier to solve. The result is a pair of CAD tools that can optimize a circuit in roughly the amount of time needed to perform a transistor level simulation of the circuit.

  14. Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer

    PubMed Central

    Qian, Qingkai; Li, Baikui; Hua, Mengyuan; Zhang, Zhaofu; Lan, Feifei; Xu, Yongkuan; Yan, Ruyue; Chen, Kevin J.

    2016-01-01

    Transistors based on MoS2 and other TMDs have been widely studied. The dangling-bond free surface of MoS2 has made the deposition of high-quality high-k dielectrics on MoS2 a challenge. The resulted transistors often suffer from the threshold voltage instability induced by the high density traps near MoS2/dielectric interface or inside the gate dielectric, which is detrimental for the practical applications of MoS2 metal-oxide-semiconductor field-effect transistor (MOSFET). In this work, by using AlN deposited by plasma enhanced atomic layer deposition (PEALD) as an interfacial layer, top-gate dielectrics as thin as 6 nm for single-layer MoS2 transistors are demonstrated. The AlN interfacial layer not only promotes the conformal deposition of high-quality Al2O3 on the dangling-bond free MoS2, but also greatly enhances the electrical stability of the MoS2 transistors. Very small hysteresis (ΔVth) is observed even at large gate biases and high temperatures. The transistor also exhibits a low level of flicker noise, which clearly originates from the Hooge mobility fluctuation instead of the carrier number fluctuation. The observed superior electrical stability of MoS2 transistor is attributed to the low border trap density of the AlN interfacial layer, as well as the small gate leakage and high dielectric strength of AlN/Al2O3 dielectric stack. PMID:27279454

  15. Automated Circuit Extraction from Mask Descriptions of MOS Networks.

    DTIC Science & Technology

    1984-02-01

    the extrinsic gate-to-drain capacitance , the other solution has an "MOS capacitor" that corrects for the same capacitances , and includes a more... extrinsic gate-to-source capacitance could be corrected with a negative capacitance . Since this element is unavailable in SPICE, it is best ignored. Drain L... capacitance , ground capacitance , and transistor dimensions-circuit parameters important in characterizing the speed, noise-immunity, and statc

  16. Large and tunable photothermoelectric effect in single-layer MoS2.

    PubMed

    Buscema, Michele; Barkelid, Maria; Zwiller, Val; van der Zant, Herre S J; Steele, Gary A; Castellanos-Gomez, Andres

    2013-02-13

    We study the photoresponse of single-layer MoS(2) field-effect transistors by scanning photocurrent microscopy. We find that, unlike in many other semiconductors, the photocurrent generation in single-layer MoS(2) is dominated by the photothermoelectric effect and not by the separation of photoexcited electron-hole pairs across the Schottky barriers at the MoS(2)/electrode interfaces. We observe a large value for the Seebeck coefficient for single-layer MoS(2) that by an external electric field can be tuned between -4 × 10(2) and -1 × 10(5) μV K(-1). This large and tunable Seebeck coefficient of the single-layer MoS(2) paves the way to new applications of this material such as on-chip thermopower generation and waste thermal energy harvesting.

  17. Effects of plasma treatment on surface properties of ultrathin layered MoS2

    NASA Astrophysics Data System (ADS)

    Kim, Suhhyun; Choi, Min Sup; Qu, Deshun; Ra, Chang Ho; Liu, Xiaochi; Kim, Minwoo; Song, Young Jae; Jong Yoo, Won

    2016-09-01

    This work investigates the use of oxygen plasma (O2) treatment, applied as an inductively coupled plasma, to control the thickness and work function of a MoS2 layer. Plasma-etched MoS2 exhibited a surface roughness similar to that of the pristine MoS2. The MoS2 field effect transistors fabricated using the plasma-etched MoS2 displayed a higher n-type doping concentration than that of pristine MoS2. The x-ray photoelectron spectroscopy was performed to analyze chemical composition to demonstrate the minimum level of chemical reactions occurred upon plasma treatment. Moreover, Kelvin probe force microscopy measurements were conducted to probe the changes in the work function that could be attributed to the changes in the surface potential. The measured work functions suggest the modification of a band structure and n-doping effect after plasma treatments that depended on the number of MoS2 layers. This study suggests that the O2 plasma can control the layer number of the MoS2 as well as the electronic properties of a MoS2 film.

  18. Thermal management in MoS2 based integrated device using near-field radiation

    NASA Astrophysics Data System (ADS)

    Peng, Jiebin; Zhang, Gang; Li, Baowen

    2015-09-01

    Recently, wafer-scale growth of monolayer MoS2 films with spatial homogeneity is realized on SiO2 substrate. Together with the latest reported high mobility, MoS2 based integrated electronic devices are expected to be fabricated in the near future. Owing to the low lattice thermal conductivity in monolayer MoS2, and the increased transistor density accompanied with the increased power density, heat dissipation will become a crucial issue for these integrated devices. In this letter, using the formalism of fluctuation electrodynamics, we explored the near-field radiative heat transfer from a monolayer MoS2 to graphene. We demonstrate that in resonance, the maximum heat transfer via near-field radiation between MoS2 and graphene can be ten times higher than the in-plane lattice thermal conduction for MoS2 sheet. Therefore, an efficient thermal management strategy for MoS2 integrated device is proposed: Graphene sheet is brought into close proximity, 10-20 nm from MoS2 device; heat energy transfer from MoS2 to graphene via near-field radiation; this amount of heat energy then be conducted to contact due to ultra-high lattice thermal conductivity of graphene. Our work sheds light for developing cooling strategy for nano devices constructing with low thermal conductivity materials.

  19. Selective Decoration of Au Nanoparticles on Monolayer MoS2 Single Crystals

    PubMed Central

    Shi, Yumeng; Huang, Jing-Kai; Jin, Limin; Hsu, Yu-Te; Yu, Siu Fung; Li, Lain-Jong; Yang, Hui Ying

    2013-01-01

    We report a controllable wet method for effective decoration of 2-dimensional (2D) molybdenum disulfide (MoS2) layers with Au nanoparticles (NPs). Au NPs can be selectively formed on the edge sites or defective sites of MoS2 layers. The Au-MoS2 nano-composites are formed by non-covalent bond. The size distribution, morphology and density of the metal nanoparticles can be tuned by changing the defect density in MoS2 layers. Field effect transistors were directly fabricated by placing ion gel gate dielectrics on Au-decorated MoS2 layers without the need to transfer these MoS2 layers to SiO2/Si substrates for bottom gate devices. The ion gel method allows probing the intrinsic electrical properties of the as-grown and Au-decorated MoS2 layers. This study shows that Au NPs impose remarkable p-doping effects to the MoS2 transistors without degrading their electrical characteristics. PMID:23670611

  20. Graphene transistors.

    PubMed

    Schwierz, Frank

    2010-07-01

    Graphene has changed from being the exclusive domain of condensed-matter physicists to being explored by those in the electron-device community. In particular, graphene-based transistors have developed rapidly and are now considered an option for post-silicon electronics. However, many details about the potential performance of graphene transistors in real applications remain unclear. Here I review the properties of graphene that are relevant to electron devices, discuss the trade-offs among these properties and examine their effects on the performance of graphene transistors in both logic and radiofrequency applications. I conclude that the excellent mobility of graphene may not, as is often assumed, be its most compelling feature from a device perspective. Rather, it may be the possibility of making devices with channels that are extremely thin that will allow graphene field-effect transistors to be scaled to shorter channel lengths and higher speeds without encountering the adverse short-channel effects that restrict the performance of existing devices. Outstanding challenges for graphene transistors include opening a sizeable and well-defined bandgap in graphene, making large-area graphene transistors that operate in the current-saturation regime and fabricating graphene nanoribbons with well-defined widths and clean edges.

  1. Transistor Effect in Improperly Connected Transistors.

    ERIC Educational Resources Information Center

    Luzader, Stephen; Sanchez-Velasco, Eduardo

    1996-01-01

    Discusses the differences between the standard representation and a realistic representation of a transistor. Presents an experiment that helps clarify the explanation of the transistor effect and shows why transistors should be connected properly. (JRH)

  2. Strain and structure heterogeneity in MoS2 atomic layers grown by chemical vapour deposition

    DOE PAGES

    Liu, Zheng; Amani, Matin; Najmaei, Sina; ...

    2014-11-18

    Monolayer molybdenum disulfide (MoS2) has attracted tremendous attention due to its promising applications in high-performance field-effect transistors, phototransistors, spintronic devices, and nonlinear optics. The enhanced photoluminescence effect in monolayer MoS2 was discovered and, as a strong tool, was employed for strain and defect analysis in MoS2. Recently, large-size monolayer MoS2 has been produced by chemical vapor deposition but has not yet been fully explored. Here we systematically characterize chemical vapor deposition grown MoS2 by PL spectroscopy and mapping, and demonstrate non-uniform strain in single-crystalline monolayer MoS2 and strain-induced band gap engineering. We also evaluate the effective strain transferred from polymermore » substrates to MoS2 by three-dimensional finite element analysis. In addition, our work demonstrates that PL mapping can be used as a non-contact approach for quick identification of grain boundaries in MoS2.« less

  3. Radiation effects on junction field-effect transistors (JFETS), MOSFETs, and bipolar transistors, as related to SSC circuit design

    SciTech Connect

    Kennedy, E.J. Oak Ridge National Lab., TN ); Alley, G.T.; Britton, C.L. Jr. ); Skubic, P.L. ); Gray, B.; Wu, A. )

    1990-01-01

    Some results of radiation effects on selected junction field-effect transistors, MOS field-effect transistors, and bipolar junction transistors are presented. The evaluations include dc parameters, as well as capacitive variations and noise evaluations. The tests are made at the low current and voltage levels (in particular, at currents {le}1 mA) that are essential for the low-power regimes required by SSC circuitry. Detailed noise data are presented both before and after 5-Mrad (gamma) total-dose exposure. SPICE radiation models for three high-frequency bipolar processes are compared for a typical charge-sensitive preamplifier.

  4. Polarization-dependent photocurrent in MoS2 phototransistor

    NASA Astrophysics Data System (ADS)

    Li, Jiu; Yu, Wentao; Chu, Saisai; Yang, Hong; Shi, Kebin; Gong, Qihuang

    2015-03-01

    Monolayer or few-layer molybdenum disulfide (MoS2) has attracted increasing interests in studying light-induced electronic effect due to its prominent photo-responsivity at visible spectral range, fast photo-switching rate and high channel mobility. However, the atomically thin layers make the interaction between light and matter much weaker than that in bulk state, hampering its application in two-dimensional material optoelectronics. One of recent efforts was to utilize resonantly enhanced localized surface plasmon for boosting light-matter interaction in MoS2 thin layer phototransistor. Randomly deposited metallic nano-particles were previously reported to modify surface of a back-gated MoS2 transistor for increasing light absorption cross-section of the phototransistor. Wavelength-dependent photocurrent enhancement was observed. In this paper, we report on a back-gated multilayer MoS2 field-effect-transistor (FET), whose surface is decorated with oriented gold nanobar array, of which the size of a single nanobar is 60nm:60nm:120nm. With these oriented nanostructures, photocurrent of the MoS2 FET could be successfully manipulated by a linear polarized incident 633nm laser, which fell into the resonance band of nanobar structure. We find that the drain-source current follows cos2θ relationship with respect to the incident polarization angle. We attribute the polarization modulation effect to the localized enhancement nature of gold nanobar layer, where the plasmon enhancement occurs only when the polarization of incident laser parallels to the longitudinal axis of nanobars and when the incident wavelength matches the resonance absorption of nanobars simultaneously. Our results indicate a promising application of polarization-dependent plasmonic manipulation in two-dimension semiconductor materials and devices.

  5. Single-layer MoS2 electronics.

    PubMed

    Lembke, Dominik; Bertolazzi, Simone; Kis, Andras

    2015-01-20

    CONSPECTUS: Atomic crystals of two-dimensional materials consisting of single sheets extracted from layered materials are gaining increasing attention. The most well-known material from this group is graphene, a single layer of graphite that can be extracted from the bulk material or grown on a suitable substrate. Its discovery has given rise to intense research effort culminating in the 2010 Nobel Prize in physics awarded to Andre Geim and Konstantin Novoselov. Graphene however represents only the proverbial tip of the iceberg, and increasing attention of researchers is now turning towards the veritable zoo of so-called "other 2D materials". They have properties complementary to graphene, which in its pristine form lacks a bandgap: MoS2, for example, is a semiconductor, while NbSe2 is a superconductor. They could hold the key to important practical applications and new scientific discoveries in the two-dimensional limit. This family of materials has been studied since the 1960s, but most of the research focused on their tribological applications: MoS2 is best known today as a high-performance dry lubricant for ultrahigh-vacuum applications and in car engines. The realization that single layers of MoS2 and related materials could also be used in functional electronic devices where they could offer advantages compared with silicon or graphene created a renewed interest in these materials. MoS2 is currently gaining the most attention because the material is easily available in the form of a mineral, molybdenite, but other 2D transition metal dichalcogenide (TMD) semiconductors are expected to have qualitatively similar properties. In this Account, we describe recent progress in the area of single-layer MoS2-based devices for electronic circuits. We will start with MoS2 transistors, which showed for the first time that devices based on MoS2 and related TMDs could have electrical properties on the same level as other, more established semiconducting materials. This

  6. Chemical doping of MoS2 multilayer by p-toluene sulfonic acid

    PubMed Central

    Andleeb, Shaista; Kumar Singh, Arun; Eom, Jonghwa

    2015-01-01

    We report the tailoring of the electrical properties of mechanically exfoliated multilayer (ML) molybdenum disulfide (MoS2) by chemical doping. Electrical charge transport and Raman spectroscopy measurements revealed that the p-toluene sulfonic acid (PTSA) imposes n-doping in ML MoS2. The shift of threshold voltage for ML MoS2 transistor was analyzed as a function of reaction time. The threshold voltage shifted toward more negative gate voltages with increasing reaction time, which indicates an n-type doping effect. The shift of the Raman peak positions was also analyzed as a function of reaction time. PTSA treatment improved the field-effect mobility by a factor of ~4 without degrading the electrical characteristics of MoS2 devices. PMID:27877810

  7. Experimental investigation of a double-diffused MOS structure

    NASA Technical Reports Server (NTRS)

    Lin, H. C.; Halsor, J. L.

    1976-01-01

    Self-aligned polysilicon gate technology was applied to double-diffused MOS (DMOS) construction in a manner that retains processing simplicity and effectively eliminates parasitic overlap capacitance because of the self-aligning feature. Depletion mode load devices with the same dimensions as the DMOS transistors were integrated. The ratioless feature results in smaller dimension load devices, allowing for higher density integration with no increase in the processing complexity of standard MOS technology. A number of inverters connected as ring oscillators were used as a vehicle to test the performance and to verify the anticipated benefits. The propagation time-power dissipation product and process related parameters were measured and evaluated. This report includes (1) details of the process; (2) test data and design details for the DMOS transistor, the load device, the inverter, the ring oscillator, and a shift register with a novel tapered geometry for the output stages; and (3) an analytical treatment of the effect of the distributed silicon gate resistance and capacitance on the speed of DMOS transistors.

  8. Electrical Transport and Low-Frequency Noise in Chemical Vapor Deposited Single-Layer MoS2 Devices

    DTIC Science & Technology

    2014-03-18

    vapor deposited (CVD) single-layer molybdenum disulfide ( MoS2 ) based back-gated field-effect transistors (FETs). Electrical characterization and LFN...measurements were conducted on MoS2 FETs with Al2O3 top-surface passivation. We also studied the effect of top-surface passivation etching on the...is unlimited. Electrical transport and low-frequency noise in chemical vapor deposited single-layer MoS2 devices The views, opinions and/or findings

  9. Shielded silicon gate complementary MOS integrated circuit.

    NASA Technical Reports Server (NTRS)

    Lin, H. C.; Halsor, J. L.; Hayes, P. J.

    1972-01-01

    An electrostatic shield for complementary MOS integrated circuits was developed to minimize the adverse effects of stray electric fields created by the potentials in the metal interconnections. The process is compatible with silicon gate technology. N-doped polycrystalline silicon was used for all the gates and the shield. The effectiveness of the shield was demonstrated by constructing a special field plate over certain transistors. The threshold voltages obtained on an oriented silicon substrate ranged from 1.5 to 3 V for either channel. Integrated inverters performed satisfactorily from 3 to 15 V, limited at the low end by the threshold voltages and at the high end by the drain breakdown voltage of the n-channel transistors. The stability of the new structure with an n-doped silicon gate as measured by the shift in C-V curve under 200 C plus or minus 20 V temperature-bias conditions was better than conventional aluminum gate or p-doped silicon gate devices, presumably due to the doping of gate oxide with phosphorous.

  10. Fast and slow border traps in MOS devices

    SciTech Connect

    Fleetwood, D.M.

    1995-09-01

    Convergent lines of evidence are reviewed which show that near-interfacial oxide traps (border traps) that exchange charge with the Si can strongly affect the performance, radiation response, and long-term reliability of MOS devices. Observable effects of border traps include capacitance-voltage (C-V) hysteresis, enhanced 1/f noise, compensation of trapped holes, and increased thermally stimulated current in MOS capacitors. Effects of fast (switching times between {approximately} 10{sup {minus}6} and 1 s) and slow (switching times greater than {approximately} 1 s) border traps have been resolved via a dual-transistor technique. In conjunction with studies of MOS electrical response, electron paramagnetic resonance and spin dependent recombination studies suggest that different types of E{prime} defects (trivalent Si centers in SiO{sub 2} associated with O vacancies) can function as border traps in MOS devices exposed to ionizing radiation or high-field stress. Hydrogen-related centers may also be border traps.

  11. Extraordinary attributes of 2-dimensional MoS2 nanosheets

    NASA Astrophysics Data System (ADS)

    Rao, C. N. R.; Maitra, Urmimala; Waghmare, Umesh V.

    2014-08-01

    The discovery of the amazing properties of graphene has stimulated exploration of single- and few-layer structures of layered inorganic materials. Of all the inorganic 2D nanosheet structures, those of MoS2 have attracted great attention because of their novel properties such as the presence of a direct bandgap, good field-effect transistor characteristics, large spin-orbit splitting, intense photoluminescence, catalytic properties, magnetism, superconductivity, ferroelectricity and several other properties with potential applications in electronics, optoelectronics, energy devices and spintronics. MoS2 nanosheets have been used in lithium batteries, supercapacitors and to generate hydrogen. Highlights of the impressive properties of MoS2 nanosheets, along with their structural and spectroscopic features are presented in this Letter. MoS2 typifies the family of metal dichalcogenides such as MoSe2 and WS2 and there is much to be done on nanosheets of these materials. Linus Pauling would have been pleased to see how molybdenite whose structure he studied in 1923 has become so important today.

  12. Abnormal electrical characteristics of multi-layered MoS2 FETs attributed to bulk traps

    NASA Astrophysics Data System (ADS)

    Kim, Choong-Ki; Yu, Chan Hak; Hur, Jae; Bae, Hagyoul; Jeon, Seung-Bae; Park, Hamin; Kim, Yong Min; Choi, Kyung Cheol; Choi, Yang-Kyu; Choi, Sung-Yool

    2016-03-01

    Multiple layers of MoS2 are used as channel materials in a type of field-effect transistor (FET). It was found that the hysteresis in transfer curves and low-frequency noise (LFN) characteristics are varied by the number of layers in MoS2 due to the different influences of bulk traps. The LFN characteristics of a FET composed of a ‘bi-layer’ MoS2 channel, which was passivated with an atomic-layer-deposited (ALD) Al2O3 layer, follow the conventional carrier number fluctuation (CNF) model. However, FETs consisting of multi-layered MoS2 channels (4, 7, 9, and 18 layers) show abnormal LFN characteristics, which substantially deviate from well-established 1/f noise models such as the CNF and Hooge’s mobility fluctuation models. The bulk traps inside the MoS2 layers are the origin of the abnormal LFN characteristics and the large hysteresis of FETs with multi-layered MoS2 is due to its randomly embedded bulk traps. Secondary ion mass spectrometry (SIMS) confirms the existence of oxygen species that induce the electrical bulk trap in the MoS2 layers.

  13. Ferroelectric Field-Effect Transistor Differential Amplifier Circuit Analysis

    NASA Technical Reports Server (NTRS)

    Phillips, Thomas A.; MacLeod, Todd C.; Ho, Fat D.

    2008-01-01

    There has been considerable research investigating the Ferroelectric Field-Effect Transistor (FeFET) in memory circuits. However, very little research has been performed in applying the FeFET to analog circuits. This paper investigates the use of FeFETs in a common analog circuit, the differential amplifier. The two input Metal-Oxide-Semiconductor (MOS) transistors in a general MOS differential amplifier circuit are replaced with FeFETs. Resistors are used in place of the other three MOS transistors. The FeFET model used in the analysis has been previously reported and was based on experimental device data. Because of the FeFET hysteresis, the FeFET differential amplifier has four different operating modes depending on whether the FeFETs are positively or negatively polarized. The FeFET differential amplifier operation in the different modes was analyzed by calculating the amplifier voltage transfer and gain characteristics shown in figures 2 through 5. Comparisons were made between the FeFET differential amplifier and the standard MOS differential amplifier. Possible applications and benefits of the FeFET differential amplifier are discussed.

  14. Few-layer molybdenum disulfide transistors and circuits for high-speed flexible electronics

    PubMed Central

    Cheng, Rui; Jiang, Shan; Chen, Yu; Liu, Yuan; Weiss, Nathan; Cheng, Hung-Chieh; Wu, Hao; Huang, Yu; Duan, Xiangfeng

    2014-01-01

    Two-dimensional layered materials, such as molybdenum disulfide, are emerging as an exciting material system for future electronics due to their unique electronic properties and atomically thin geometry. Here we report a systematic investigation of MoS2 transistors with optimized contact and device geometry, to achieve self-aligned devices with performance including an intrinsic gain over 30, an intrinsic cut-off frequency fT up to 42 GHz and a maximum oscillation frequency fMAX up to 50 GHz, exceeding the reported values for MoS2 transistors to date (fT ~ 0.9 GHz, fMAX ~ 1 GHz). Our results show that logic inverters or radio frequency amplifiers can be formed by integrating multiple MoS2 transistors on quartz or flexible substrates with voltage gain in the gigahertz regime. This study demonstrates the potential of two-dimensional layered semiconductors for high-speed flexible electronics. PMID:25295573

  15. Electron-hole transport and photovoltaic effect in gated MoS2 Schottky junctions

    PubMed Central

    Fontana, Marcio; Deppe, Tristan; Boyd, Anthony K.; Rinzan, Mohamed; Liu, Amy Y.; Paranjape, Makarand; Barbara, Paola

    2013-01-01

    Semiconducting molybdenum disulfphide has emerged as an attractive material for novel nanoscale optoelectronic devices due to its reduced dimensionality and large direct bandgap. Since optoelectronic devices require electron-hole generation/recombination, it is important to be able to fabricate ambipolar transistors to investigate charge transport both in the conduction band and in the valence band. Although n-type transistor operation for single-layer and few-layer MoS2 with gold source and drain contacts was recently demonstrated, transport in the valence band has been elusive for solid-state devices. Here we show that a multi-layer MoS2 channel can be hole-doped by palladium contacts, yielding MoS2 p-type transistors. When two different materials are used for the source and drain contacts, for example hole-doping Pd and electron-doping Au, the Schottky junctions formed at the MoS2 contacts produce a clear photovoltaic effect. PMID:23567328

  16. Superconducting transistor

    DOEpatents

    Gray, Kenneth E.

    1979-01-01

    A superconducting transistor is formed by disposing three thin films of superconducting material in a planar parallel arrangement and insulating the films from each other by layers of insulating oxides to form two tunnel junctions. One junction is biased above twice the superconducting energy gap and the other is biased at less than twice the superconducting energy gap. Injection of quasiparticles into the center film by one junction provides a current gain in the second junction.

  17. New generation transistor technologies enabled by 2D crystals

    NASA Astrophysics Data System (ADS)

    Jena, D.

    2013-05-01

    The discovery of graphene opened the door to 2D crystal materials. The lack of a bandgap in 2D graphene makes it unsuitable for electronic switching transistors in the conventional field-effect sense, though possible techniques exploiting the unique bandstructure and nanostructures are being explored. The transition metal dichalcogenides have 2D crystal semiconductors, which are well-suited for electronic switching. We experimentally demonstrate field effect transistors with current saturation and carrier inversion made from layered 2D crystal semiconductors such as MoS2, WS2, and the related family. We also evaluate the feasibility of such semiconducting 2D crystals for tunneling field effect transistors for low-power digital logic. The article summarizes the current state of new generation transistor technologies either proposed, or demonstrated, with a commentary on the challenges and prospects moving forward.

  18. Layer thinning and etching of mechanically exfoliated MoS2 nanosheets by thermal annealing in air.

    PubMed

    Wu, Jumiati; Li, Hai; Yin, Zongyou; Li, Hong; Liu, Juqing; Cao, Xiehong; Zhang, Qing; Zhang, Hua

    2013-10-11

    A simple thermal annealing method for layer thinning and etching of mechanically exfoliated MoS2 nanosheets in air is reported. Using this method, single-layer (1L) MoS2 nanosheets are achieved after the thinning of MoS2 nanosheets from double-layer (2L) to quadri-layer (4L) at 330 °C. The as-prepared 1L MoS2 nanosheet shows comparable optical and electrical properties with the mechanically exfoliated, pristine one. In addition, for the first time, the MoS2 mesh with high-density of triangular pits is also fabricated at 330 °C, which might arise from the anisotropic etching of the active MoS2 edge sites. As a result of thermal annealing in air, the thinning of MoS2 nanosheet is possible due to its oxidation to form MoO3 . Importantly, the MoO3 fragments on the top of thinned MoS2 layer induces the hole injection, resulting in the p-type channel in fabricated field-effect transistors.

  19. Direct growth of single- and few-layer MoS2 on h-BN by CVD method

    NASA Astrophysics Data System (ADS)

    Yan, Aiming; Velasco, Jairo, Jr.; Kahn, Salman; Watanabe, Kenji; Taniguchi, Takashi; Wang, Feng; Crommie, Michael; Zettl, Alex

    As a promising candidate for the next-generation electronics, large-scale single- and few-layer molybdenum disulfide (MoS2) grown by CVD method is an important advancement towards technological implementation of this material. However, the choice of substrate can significantly affect the performance of MoS2 based devices. An attractive insulating substrate or mate for MoS2 (and related materials such as graphene) is hexagonal boron nitride (h-BN). Stacked heterostructures of MoS2 and h-BN have been produced by manual transfer methods, but a more efficient and scalable assembly method is needed. Here we demonstrate the direct growth of single- and few-layer MoS2 on h-BN by chemical vapor deposition (CVD) method. The growth mechanisms for single- and few-layer samples are found to be distinct, and for single-layer samples low relative rotation angles (<5°) between the MoS2 and h-BN lattices prevail. In addition, MoS2 directly grown on h-BN maintains its intrinsic 1.89 eV bandgap. Our CVD synthesis method presents a viable path towards high-quality MoS2 based field effect transistors in a controllable and scalable fashion. Acknowledgement: the U.S. Department of Energy under Contract DE-AC02-05CH11231; NSF Grant DMR-1206512.

  20. A scaleable technique for the measurement of intrinsic MOS capacitance with atto-farad resolution

    NASA Astrophysics Data System (ADS)

    Iwai, H.; Oristian, J. E.; Walker, J. T.; Dutton, R. W.

    1985-02-01

    An on-chip capacitance measurement technique used for interline capacitances has been extended to MOS transistor capacitance measurements. The gate of the test transistor is connected to a reference capacitance made on the same chip. Small ac signals are applied to one of the transistor terminals successively. The magnitude of the ac voltages appearing on the gate node is measured indirectly. C(gd), C(gs), and C(gb) are calculated accurately from the measured ac voltage and the reference capacitance value. It was found that C(gd) and C(gs) are measured completely free of parasitic capacitances resulting from both the internal on-chip circuit and external wiring. The on-chip circuitry is simple and can easily be scaled down. These features insure this technique is the most suitable for the measurement of minimum geometry transistors with atto-farad-range resolution. It is shown that this technique has the ability to detect the capacitance difference which comes from the misalignment of source and drain metal connections. Measurements with this technique are used to first describe the short- and narrow-channel effects on MOS transistor capacitance.

  1. Large scale MoS2 nanosheet logic circuits integrated by photolithography on glass

    NASA Astrophysics Data System (ADS)

    Kwon, Hyeokjae; Jeon, Pyo Jin; Kim, Jin Sung; Kim, Tae-Young; Yun, Hoyeol; Lee, Sang Wook; Lee, Takhee; Im, Seongil

    2016-12-01

    We demonstrate 500 × 500 μm2 large scale polygrain MoS2 nanosheets and field effect transistor (FET) circuits integrated using those nanosheets, which are initially grown on SiO2/p+-Si by chemical vapor deposition but transferred onto glass substrate to be patterned by photolithography. In fact, large scale growth of two-dimensional MoS2 and its conventional way of patterning for integrated devices have remained as one of the unresolved important issues. In the present study, we achieved maximum linear mobility of ˜9 cm2 V-1 s-1 from single-domain MoS2 FET on SiO2/p+-Si substrate and 0.5˜3.0 cm2 V-1 s-1 from large scale MoS2 sheet transferred onto glass. Such reduced mobility is attributed to the transfer process-induced wrinkles and crevices, domain boundaries, residue on MoS2, and loss of the back gate-charging effects that might exist due to SiO2/p+-Si substrate. Among 16 MoS2-based FETs, 13 devices successfully work (yield was more than 80%) producing NOT, NOR, and NAND logic circuits. Inverter (NOT gate) shows quite a high voltage gain over 12 at a supply voltage of 5 V, also displaying 60 μs switching speed in kilohertz dynamics.

  2. Inversion layer MOS solar cells

    NASA Technical Reports Server (NTRS)

    Ho, Fat Duen

    1986-01-01

    Inversion layer (IL) Metal Oxide Semiconductor (MOS) solar cells were fabricated. The fabrication technique and problems are discussed. A plan for modeling IL cells is presented. Future work in this area is addressed.

  3. Memristive Phenomena in Polycrystalline Single Layer MoS2

    NASA Astrophysics Data System (ADS)

    Sangwan, Vinod; Jariwala, Deep; Kim, In-Soo; Chen, Kan-Sheng; Marks, Tobin; Lauhon, Lincoln; Hersam, Mark; Hersam Laboratory Team

    Recently, a new class of layered two-dimensional semiconductors has shown promise for various electronic applications. In particular, single layer transition metal dichalcogenides (e.g. MoS2) present a host of attractive features such as high electrical conductivity, tunable band-gap, and strong light-matter interaction. However, available growth methods produce large-area polycrystalline films with grain-boundaries and point defects that can be detrimental in conventional electronic devices. In contrast, we have developed unconventional device structures that exploit these defects for useful electronic functions. In particular, we observe grain-boundary mediated memristive phenomena in single layer MoS2 transistors. Memristor current-voltage characteristics depend strongly on the topology of grain-boundaries in MoS2. A grain boundary directly connecting metal electrodes produces thermally assisted switching with dynamic negative differential resistance, whereas a grain boundary bisecting the channel shows non-filamentary soft-switching. In addition, devices with intersecting grain boundaries in the channel show bipolar resistive switching with high on/off ratios up to ~103. Furthermore, the gate electrode in the field-effect geometry can be used to control the absolute resistance of the on and off states. Complementary electrostatic force microscopy, photoluminescence, and Raman microscopy reveal the role of sulfur vacancies in the switching mechanism.

  4. Memristive Phenomena in Polycrystalline Single Layer MoS2

    NASA Astrophysics Data System (ADS)

    Sangwan, Vinod; Jariwala, Deep; Kim, In-Soo; Chen, Kan-Sheng; Marks, Tobin; Lauhon, Lincoln; Hersam, Mark; Hersam Laboratory Team

    Recently, a new class of layered two-dimensional semiconductors has shown promise for various electronic applications. In particular, ultrathin transition metal dichalcogenides (e.g. MoS2) present a host of attractive features such as high carrier mobility and tunable band-gap. However, available growth methods produce polycrystalline films with grain-boundaries and point defects that can be detrimental in conventional electronic devices. In contrast, we have developed unconventional device structures that exploit these defects for useful electronic functions. In particular, we observe grain-boundary mediated memristive phenomena in single layer MoS2 transistors. Memristor current-voltage characteristics depend strongly on the topology of grain-boundaries in MoS2. A grain boundary directly connecting metal electrodes produces thermally assisted switching with dynamic negative differential resistance, whereas a grain boundary bisecting the channel shows non-filamentary soft-switching. In addition, devices with intersecting grain boundaries in the channel show bipolar resistive switching with high on/off ratios up to ~103. Furthermore, the gate electrode in the field-effect geometry can be used to control the absolute resistance of the on and off states. Correlated electrostatic force microscopy, photoluminescence, and Raman microscopy reveal the role of sulfur vacancies in the switching mechanism. This abstract is replacing MAR16-2015-004166 that had exceeded the character limit.

  5. Total Ionizing Dose Effects in MOS Oxides and Devices

    NASA Technical Reports Server (NTRS)

    Oldham, Timothy R.; McLean, F. B.

    2003-01-01

    The development of military and space electronics technology has traditionally been heavily influenced by the commercial semiconductor industry. The development of MOS technology, and particularly CMOS technology, as dominant commercial technologies has occurred entirely within the lifetime of the NSREC. For this reason, it is not surprising that the study of radiation interactions with MOS materials, devices and circuits has been a major theme of this conference for most of its history. The basic radiation problem in a MOS transistor is illustrated. The application of an appropriate gate voltage causes a conducting channel to form between the source and drain, so that current flows when the device is turned on. In Fig. lb, the effect of ionizing radiation is illustrated. Radiation-induced trapped charge has built up in the gate oxide, which causes a shift in the threshold voltage (that is, a change in the voltage which must be applied to turn the device on). If this shift is large enough, the device cannot be turned off, even at zero volts applied, and the device is said to have failed by going depletion mode.

  6. Electrical Transport Properties of Polymorphic MoS2.

    PubMed

    Kim, Jun Suk; Kim, Jaesu; Zhao, Jiong; Kim, Sungho; Lee, Jin Hee; Jin, Youngjo; Choi, Homin; Moon, Byoung Hee; Bae, Jung Jun; Lee, Young Hee; Lim, Seong Chu

    2016-08-23

    The engineering of polymorphs in two-dimensional layered materials has recently attracted significant interest. Although the semiconducting (2H) and metallic (1T) phases are known to be stable in thin-film MoTe2, semiconducting 2H-MoS2 is locally converted into metallic 1T-MoS2 through chemical lithiation. In this paper, we describe the observation of the 2H, 1T, and 1T' phases coexisting in Li-treated MoS2, which result in unusual transport phenomena. Although multiphase MoS2 shows no transistor-gating response, the channel resistance decreases in proportion to the temperature, similar to the behavior of a typical semiconductor. Transmission electron microscopy images clearly show that the 1T and 1T' phases are randomly distributed and intervened with 2H-MoS2, which is referred to as the 1T and 1T' puddling phenomenon. The resistance curve fits well with 2D-variable range-hopping transport behavior, where electrons hop over 1T domains that are bounded by semiconducting 2H phases. However, near 30 K, electrons hop over charge puddles. The large temperature coefficient of resistance (TCR) of multiphase MoS2, -2.0 × 10(-2) K(-1) at 300 K, allows for efficient IR detection at room temperature by means of the photothermal effect.

  7. Large-area few-layer MoS2 deposited by sputtering

    NASA Astrophysics Data System (ADS)

    Huang, Jyun-Hong; Chen, Hsing-Hung; Liu, Pang-Shiuan; Lu, Li-Syuan; Wu, Chien-Ting; Chou, Cheng-Tung; Lee, Yao-Jen; Li, Lain-Jong; Chang, Wen-Hao; Hou, Tuo-Hung

    2016-06-01

    Direct magnetron sputtering of transition metal dichalcogenide targets is proposed as a new approach for depositing large-area two-dimensional layered materials. Bilayer to few-layer MoS2 deposited by magnetron sputtering followed by post-deposition annealing shows superior area scalability over 20 cm2 and layer-by-layer controllability. High crystallinity of layered MoS2 was confirmed by Raman, photo-luminescence, and transmission electron microscopy analysis. The sputtering temperature and annealing ambience were found to play an important role in the film quality. The top-gate field-effect transistor by using the layered MoS2 channel shows typical n-type characteristics with a current on/off ratio of approximately 104. The relatively low mobility is attributed to the small grain size of 0.1-1 μm with a trap charge density in grain boundaries of the order of 1013 cm-2.

  8. Total Ionizing Dose Effects on Strained Ge pMOS FinFETs on Bulk Si

    DOE PAGES

    Zhang, En Xia; Fleetwood, Daniel M.; Hachtel, Jordan A.; ...

    2016-12-02

    In this paper, we have characterized the total ionizing dose response of strained Ge p MOS FinFETs built on bulk Si using a fin replacement process. Devices irradiated to 1.0 Mrad(SiO2) show minimal transconductance degradation (less than 5%), very small Vth shifts (less than 40 mV in magnitude) and very little ON/OFF current ratio degradation (<5%), and only modest variation in radiation response with transistor geometry (typically less than normal part-to-part variation). Both before and after irradiation, the performance of these strained Ge p MOS FinFETs is far superior to that of past generations of planar Ge p MOS devices.more » Finally, these improved properties result from significant improvements in processing technology, as well as the enhanced gate control provided by the strained Ge FinFET technology.« less

  9. Total Ionizing Dose Effects on Strained Ge pMOS FinFETs on Bulk Si

    SciTech Connect

    Zhang, En Xia; Fleetwood, Daniel M.; Hachtel, Jordan A.; Oak Ridge National Lab. , Oak Ridge, TN ; Liang, Chundong; Reed, Robert A.; Alles, Michael L.; Schrimpf, Ronald D.; Linten, Dimitri; Mitard, Jerome; Chisholm, Matthew F.; Pantelides, Sokrates T.; Oak Ridge National Lab. , Oak Ridge, TN

    2016-12-02

    In this paper, we have characterized the total ionizing dose response of strained Ge p MOS FinFETs built on bulk Si using a fin replacement process. Devices irradiated to 1.0 Mrad(SiO2) show minimal transconductance degradation (less than 5%), very small Vth shifts (less than 40 mV in magnitude) and very little ON/OFF current ratio degradation (<5%), and only modest variation in radiation response with transistor geometry (typically less than normal part-to-part variation). Both before and after irradiation, the performance of these strained Ge p MOS FinFETs is far superior to that of past generations of planar Ge p MOS devices. Finally, these improved properties result from significant improvements in processing technology, as well as the enhanced gate control provided by the strained Ge FinFET technology.

  10. Study of interface state trap density on characteristics of MOS-HEMT

    NASA Astrophysics Data System (ADS)

    Tseng, Ming-Chun; Hung, Ming-Hsien; Wuu, Dong-Sing; Horng, Ray-Hua

    2015-03-01

    In this study, the effects of chemical treatment on the properties of MOS capacitors and metal-oxide-semiconductor high electron mobility transistor (MOS-HEMT) were studied. The structure consist of Al2O3/u-GaN/AlN buffer/ Si substrate and Al2O3 (10 nm)/u-AlGaN (25 nm)/u-GaN (2μm)/AlN buffer/Si substrate for MOS capacitor and MOS-HEMT device, respectively. There are four chemical treatment recipes, which consist of organic solvents, oxygen plasma, BCl3 plasma, dilute acidic solvent, hydrofluoric acid and RCA-like clean process to remove the metal ions, organic contamination and native oxide. Four different chemical treatment recipes treated the surface of u-GaN before Al2O3 was grown on the treated surface to reduce the interface state trap densities (Dit). The Dit value was calculated from measurement of C-V curve with 1M Hz frequency. The formation of interface state trap of u-GaN surface is modified by different chemical solution of varied chemical treatment recipe, which further influence the breakdown voltage (Vbk), on-resistance (Ron), threshold voltage (Vth) and drain current (Id) of MOS-HEMT. The Vth of MOS-HEMT with organic solvents clean treatment is -11.00V. The MOS-HEMT after BCl3 plasma and organic solvents clean treatment shows the lowest Vth of -9.55V. The electronic characteristics of MOS HEMT device with four different chemical treatment recipes were investigated in this article.

  11. Atomic Layer Etching Mechanism of MoS2 for Nanodevices.

    PubMed

    Kim, Ki Seok; Kim, Ki Hyun; Nam, Yeonsig; Jeon, Jaeho; Yim, Soonmin; Singh, Eric; Lee, Jin Yong; Lee, Sung Joo; Jung, Yeon Sik; Yeom, Geun Young; Kim, Dong Woo

    2017-04-05

    Among the layered transition metal dichalcogenides (TMDs) that can form stable two-dimensional crystal structures, molybdenum disulfide (MoS2) has been intensively investigated because of its unique properties in various electronic and optoelectronic applications with different band gap energies from 1.29 to 1.9 eV as the number of layers decreases. To control the MoS2 layers, atomic layer etching (ALE) (which is a cyclic etching consisting of a radical-adsorption step such as Cl adsorption and a reacted-compound-desorption step via a low-energy Ar(+)-ion exposure) can be a highly effective technique to avoid inducing damage and contamination that occur during the reactive steps. Whereas graphene is composed of one-atom-thick layers, MoS2 is composed of three-atom-thick S(top)-Mo(mid)-S(bottom) layers; therefore, the ALE mechanisms of the two structures are significantly different. In this study, for MoS2 ALE, the Cl radical is used as the adsorption species and a low-energy Ar(+) ion is used as the desorption species. A MoS2 ALE mechanism (by which the S(top), Mo(mid), and S(bottom) atoms are sequentially removed from the MoS2 crystal structure due to the trapped Cl atoms between the S(top) layer and the Mo(mid) layer) is reported according to the results of an experiment and a simulation. In addition, the ALE technique shows that a monolayer MoS2 field effect transistor (FET) fabricated after one cycle of ALE is undamaged and exhibits electrical characteristics similar to those of a pristine monolayer MoS2 FET. This technique is also applicable to all layered TMD materials, such as tungsten disulfide (WS2), molybdenum diselenide (MoSe2), and tungsten diselenide (WSe2).

  12. Flexible low-power RF nanoelectronics in the GHz regime using CVD MoS2

    NASA Astrophysics Data System (ADS)

    Yogeesh, Maruthi

    Two-dimensional (2D) materials have attracted substantial interest for flexible nanoelectronics due to the overall device mechanical flexibility and thickness scalability for high mechanical performance and low operating power. In this work, we demonstrate the first MoS2 RF transistors on flexible substrates based on CVD-grown monolayers, featuring record GHz cutoff frequency (5.6 GHz) and saturation velocity (~1.8×106 cm/s), which is significantly superior to contemporary organic and metal oxide thin-film transistors. Furthermore, multicycle three-point bending results demonstrated the electrical robustness of our flexible MoS2 transistors after 10,000 cycles of mechanical bending. Additionally, basic RF communication circuit blocks such as amplifier, mixer and wireless AM receiver have been demonstrated. These collective results indicate that MoS2 is an ideal advanced semiconducting material for low-power, RF devices for large-area flexible nanoelectronics and smart nanosystems owing to its unique combination of large bandgap, high saturation velocity and high mechanical strength.

  13. Interface Properties of Atomic-Layer-Deposited Al2O3 Thin Films on Ultraviolet/Ozone-Treated Multilayer MoS2 Crystals.

    PubMed

    Park, Seonyoung; Kim, Seong Yeoul; Choi, Yura; Kim, Myungjun; Shin, Hyunjung; Kim, Jiyoung; Choi, Woong

    2016-05-11

    We report the interface properties of atomic-layer-deposited Al2O3 thin films on ultraviolet/ozone (UV/O3)-treated multilayer MoS2 crystals. The formation of S-O bonds on MoS2 after low-power UV/O3 treatment increased the surface energy, allowing the subsequent deposition of uniform Al2O3 thin films. The capacitance-voltage measurement of Au-Al2O3-MoS2 metal oxide semiconductor capacitors indicated n-type MoS2 with an electron density of ∼10(17) cm(-3) and a minimum interface trap density of ∼10(11) cm(-2) eV(-1). These results demonstrate the possibility of forming a high-quality Al2O3-MoS2 interface by proper UV/O3 treatment, providing important implications for their integration into field-effect transistors.

  14. Transistor analogs of emergent iono-neuronal dynamics

    PubMed Central

    Rachmuth, Guy; Poon, Chi-Sang

    2008-01-01

    Neuromorphic analog metal-oxide-silicon (MOS) transistor circuits promise compact, low-power, and high-speed emulations of iono-neuronal dynamics orders-of-magnitude faster than digital simulation. However, their inherently limited input voltage dynamic range vs power consumption and silicon die area tradeoffs makes them highly sensitive to transistor mismatch due to fabrication inaccuracy, device noise, and other nonidealities. This limitation precludes robust analog very-large-scale-integration (aVLSI) circuits implementation of emergent iono-neuronal dynamics computations beyond simple spiking with limited ion channel dynamics. Here we present versatile neuromorphic analog building-block circuits that afford near-maximum voltage dynamic range operating within the low-power MOS transistor weak-inversion regime which is ideal for aVLSI implementation or implantable biomimetic device applications. The fabricated microchip allowed robust realization of dynamic iono-neuronal computations such as coincidence detection of presynaptic spikes or pre- and postsynaptic activities. As a critical performance benchmark, the high-speed and highly interactive iono-neuronal simulation capability on-chip enabled our prompt discovery of a minimal model of chaotic pacemaker bursting, an emergent iono-neuronal behavior of fundamental biological significance which has hitherto defied experimental testing or computational exploration via conventional digital or analog simulations. These compact and power-efficient transistor analogs of emergent iono-neuronal dynamics open new avenues for next-generation neuromorphic, neuroprosthetic, and brain-machine interface applications. PMID:19404469

  15. Multibit data storage states formed in plasma-treated MoS₂ transistors.

    PubMed

    Chen, Mikai; Nam, Hongsuk; Wi, Sungjin; Priessnitz, Greg; Gunawan, Ivan Manuel; Liang, Xiaogan

    2014-04-22

    New multibit memory devices are desirable for improving data storage density and computing speed. Here, we report that multilayer MoS2 transistors, when treated with plasmas, can dramatically serve as low-cost, nonvolatile, highly durable memories with binary and multibit data storage capability. We have demonstrated binary and 2-bit/transistor (or 4-level) data states suitable for year-scale data storage applications as well as 3-bit/transistor (or 8-level) data states for day-scale data storage. This multibit memory capability is hypothesized to be attributed to plasma-induced doping and ripple of the top MoS2 layers in a transistor, which could form an ambipolar charge-trapping layer interfacing the underlying MoS2 channel. This structure could enable the nonvolatile retention of charged carriers as well as the reversible modulation of polarity and amount of the trapped charge, ultimately resulting in multilevel data states in memory transistors. Our Kelvin force microscopy results strongly support this hypothesis. In addition, our research suggests that the programming speed of such memories can be improved by using nanoscale-area plasma treatment. We anticipate that this work would provide important scientific insights for leveraging the unique structural property of atomically layered two-dimensional materials in nanoelectronic applications.

  16. STABILIZED TRANSISTOR AMPLIFIER

    DOEpatents

    Noe, J.B.

    1963-05-01

    A temperature stabilized transistor amplifier having a pair of transistors coupled in cascade relation that are capable of providing amplification through a temperature range of - 100 un. Concent 85% F to 400 un. Concent 85% F described. The stabilization of the amplifier is attained by coupling a feedback signal taken from the emitter of second transistor at a junction between two serially arranged biasing resistances in the circuit of the emitter of the second transistor to the base of the first transistor. Thus, a change in the emitter current of the second transistor is automatically corrected by the feedback adjustment of the base-emitter potential of the first transistor and by a corresponding change in the base-emitter potential of the second transistor. (AEC)

  17. Nanoscale inhomogeneity of the Schottky barrier and resistivity in MoS2 multilayers

    NASA Astrophysics Data System (ADS)

    Giannazzo, F.; Fisichella, G.; Piazza, A.; Agnello, S.; Roccaforte, F.

    2015-08-01

    Conductive atomic force microscopy (CAFM) is employed to investigate the current injection from a nanometric contact (a Pt coated tip) to the surface of MoS2 thin films. The analysis of local current-voltage characteristics on a large array of tip positions provides high spatial resolution information on the lateral homogeneity of the tip /MoS2 Schottky barrier ΦB and ideality factor n , and on the local resistivity ρloc of the MoS2 region under the tip. Here, ΦB=300 ±24 meV , n =1.60 ±0.23 , and ρloc=2.99 ±0.68 Ω cm are calculated from the distributions of locally measured values. A linear correlation is found between the ρloc and ΦB values at each tip position, indicating a similar origin of the ρloc and ΦB inhomogeneities. These findings are compared with recent literature results on the role of sulfur vacancy clusters on the MoS2 surface as preferential paths for current injection from metal contacts. Furthermore, their implications on the behavior of MoS2 based transistors are discussed.

  18. Single-layer MoS2 nanopores as nanopower generators

    NASA Astrophysics Data System (ADS)

    Feng, Jiandong; Graf, Michael; Liu, Ke; Ovchinnikov, Dmitry; Dumcenco, Dumitru; Heiranian, Mohammad; Nandigana, Vishal; Aluru, Narayana R.; Kis, Andras; Radenovic, Aleksandra

    2016-08-01

    Making use of the osmotic pressure difference between fresh water and seawater is an attractive, renewable and clean way to generate power and is known as ‘blue energy’. Another electrokinetic phenomenon, called the streaming potential, occurs when an electrolyte is driven through narrow pores either by a pressure gradient or by an osmotic potential resulting from a salt concentration gradient. For this task, membranes made of two-dimensional materials are expected to be the most efficient, because water transport through a membrane scales inversely with membrane thickness. Here we demonstrate the use of single-layer molybdenum disulfide (MoS2) nanopores as osmotic nanopower generators. We observe a large, osmotically induced current produced from a salt gradient with an estimated power density of up to 106 watts per square metre—a current that can be attributed mainly to the atomically thin membrane of MoS2. Low power requirements for nanoelectronic and optoelectric devices can be provided by a neighbouring nanogenerator that harvests energy from the local environment—for example, a piezoelectric zinc oxide nanowire array or single-layer MoS2 (ref. 12). We use our MoS2 nanopore generator to power a MoS2 transistor, thus demonstrating a self-powered nanosystem.

  19. Mobility engineering and a metal-insulator transition in monolayer MoS2

    NASA Astrophysics Data System (ADS)

    Radisavljevic, Branimir; Kis, Andras

    2013-09-01

    Two-dimensional (2D) materials are a new class of materials with interesting physical properties and applications ranging from nanoelectronics to sensing and photonics. In addition to graphene, the most studied 2D material, monolayers of other layered materials such as semiconducting dichalcogenides MoS2 or WSe2 are gaining in importance as promising channel materials for field-effect transistors (FETs). The presence of a direct bandgap in monolayer MoS2 due to quantum-mechanical confinement allows room-temperature FETs with an on/off ratio exceeding 108. The presence of high- κ dielectrics in these devices enhanced their mobility, but the mechanisms are not well understood. Here, we report on electrical transport measurements on MoS2 FETs in different dielectric configurations. The dependence of mobility on temperature shows clear evidence of the strong suppression of charged-impurity scattering in dual-gate devices with a top-gate dielectric. At the same time, phonon scattering shows a weaker than expected temperature dependence. High levels of doping achieved in dual-gate devices also allow the observation of a metal-insulator transition in monolayer MoS2 due to strong electron-electron interactions. Our work opens up the way to further improvements in 2D semiconductor performance and introduces MoS2 as an interesting system for studying correlation effects in mesoscopic systems.

  20. Can a Black Phosphorus Schottky Barrier Transistor Be Good Enough?

    PubMed

    Quhe, Ruge; Peng, Xiyou; Pan, Yuanyuan; Ye, Meng; Wang, Yangyang; Zhang, Han; Feng, Shenyan; Zhang, Qiaoxuan; Shi, Junjie; Yang, Jinbo; Yu, Dapeng; Lei, Ming; Lu, Jing

    2017-02-01

    Experimental two-dimensional (2D) black phosphorus (BP) transistors typically appear in the form of Schottky barrier field effect transistors (SBFETs), but their performance limit remains open. We investigate the performance limit of monolayer BP SBFETs in the sub-10 nm scale by using ab initio quantum transport simulations. The devices with 2D graphene electrodes are apparently superior to those with bulk Ti electrodes due to their smaller and tunable Schottky barrier heights and the absence of metal induced gap states in the channels. With graphene electrodes, the performance limit of the sub-10 nm monolayer BP SBFETs outperforms the monolayer MoS2, carbon nanotube, and advanced silicon transistors and even can meet the requirements of both high performance and low power logic applications of the next decade in the latest International Technology Roadmap for Semiconductors. It appears that the ML BP SBFETs have the best intrinsic device performance among the reported sub-10 nm 2D material SBFETs.

  1. Radiation damage testing of transistors for SSC front-end electronics

    SciTech Connect

    Dawson, J.; Ekenberg, T.; Stevens, A. ); Kraner, H.; Radeka, V.; Rescia, S. ); Kerns, S. . Dept. of Electrical Engineering)

    1990-01-01

    Over the ten year expected lifetime of a typical SSC detector operating at the design luminosity of 10{sup 33} cm{sup {minus}2}s{sup {minus}1}, the front-end electronics at large pseudorapidities may receive total doses as high as 20 MRad(Si) of ionizing radiation and 10{sup 16} neutrons/cm{sup 2}. Discrete JFETs and monolithic MOS and bipolar transistors have been irradiated at 10 MRad(Si) and 10{sup 14} neutrons/cm{sup 2}, and the effect on transfer characteristics and noise performance have been measured. All transistors were still functional after irradiation but suffered increased noise and the MOS transistors showed significant threshold shifts and increased leakage currents. 4 refs., 2 figs.

  2. Scalable Patterning of MoS2 Nanoribbons by Micromolding in Capillaries.

    PubMed

    Hung, Yu-Han; Lu, Ang-Yu; Chang, Yung-Huang; Huang, Jing-Kai; Chang, Jeng-Kuei; Li, Lain-Jong; Su, Ching-Yuan

    2016-08-17

    In this study, we report a facile approach to prepare dense arrays of MoS2 nanoribbons by combining procedures of micromolding in capillaries (MIMIC) and thermolysis of thiosalts ((NH4)2MoS4) as the printing ink. The obtained MoS2 nanoribbons had a thickness reaching as low as 3.9 nm, a width ranging from 157 to 465 nm, and a length up to 2 cm. MoS2 nanoribbons with an extremely high aspect ratio (length/width) of ∼7.4 × 10(8) were achieved. The MoS2 pattern can be printed on versatile substrates, such as SiO2/Si, sapphire, Au film, FTO/glass, and graphene-coated glass. The degree of crystallinity of the as-prepared MoS2 was discovered to be adjustable by varying the temperature through postannealing. The high-temperature thermolysis (1000 °C) results in high-quality conductive samples, and field-effect transistors based on the patterned MoS2 nanoribbons were demonstrated and characterized, where the carrier mobility was comparable to that of thin-film MoS2. In contrast, the low-temperature-treated samples (170 °C) result in a unique nanocrystalline MoSx structure (x ≈ 2.5), where the abundant and exposed edge sites were obtained from highly dense arrays of nanoribbon structures by this MIMIC patterning method. The patterned MoSx was revealed to have superior electrocatalytic efficiency (an overpotential of ∼211 mV at 10 mA/cm(2) and a Tafel slope of 43 mV/dec) in the hydrogen evolution reaction (HER) when compared to the thin-film MoS2. The report introduces a new concept for rapidly fabricating cost-effective and high-density MoS2/MoSx nanostructures on versatile substrates, which may pave the way for potential applications in nanoelectronics/optoelectronics and frontier energy materials.

  3. BATMAN: MOS Spectroscopy on Demand

    NASA Astrophysics Data System (ADS)

    Molinari, E.; Zamkotsian, F.; Moschetti, M.; Spano, P.; Boschin, W.; Cosentino, R.; Ghedina, A.; González, M.; Pérez, H.; Lanzoni, P.; Ramarijaona, H.; Riva, M.; Zerbi, F.; Nicastro, L.; Valenziano, L.; Di Marcantonio, P.; Coretti, I.; Cirami, R.

    2016-10-01

    Multi-Object Spectrographs (MOS) are the major instruments for studying primary galaxies and remote and faint objects. Current object selection systems are limited and/or difficult to implement in next generation MOS for space and ground-based telescopes. A promising solution is the use of MOEMS devices such as micromirror arrays, which allow the remote control of the multi-slit configuration in real time. TNG is hosting a novelty project for real-time, on-demand MOS masks based on MOEMS programmable slits. We are developing a 2048×1080 Digital-Micromirror-Device-based (DMD) MOS instrument to be mounted on the Galileo telescope, called BATMAN. It is a two-arm instrument designed for providing in parallel imaging and spectroscopic capabilities. With a field of view of 6.8×3.6 arcmin and a plate scale of 0.2 arcsec per micromirror, this astronomical setup can be used to investigate the formation and evolution of galaxies. The wavelength range is in the visible and the spectral resolution is R=560 for a 1 arcsec object, and the two arms will have 2k × 4k CCD detectors. ROBIN, a BATMAN demonstrator, has been designed, realized and integrated. We plan to have BATMAN first light by mid-2016.

  4. Interlayer resistance of misoriented MoS2.

    PubMed

    Zhou, Kuan; Wickramaratne, Darshana; Ge, Supeng; Su, Shanshan; De, Amrit; Lake, Roger K

    2017-04-05

    Interlayer misorientation in transition metal dichalcogenides alters their interlayer distance, total energy, electronic band structure, and vibrational modes, but its effect on the interlayer resistance is not known. This study analyzes the interlayer resistance of misoriented bilayer MoS2 as a function of the misorientation angle, and it shows that interlayer misorientation exponentially increases the electron resistivity while leaving the hole resistivity almost unchanged. The physics, determined by the wave functions at the high symmetry points, are generic among the popular semiconducting transition metal dichalcogenides (TMDs). The asymmetrical effect of misorientation on the electron and hole transport may be exploited in the design and optimization of vertical transport devices such as a bipolar transistor. Density functional theory provides the interlayer coupling elements used for the resistivity calculations.

  5. Controlled Scalable Synthesis of Uniform, High-Quality Monolayer and Few-layer MoS2 Films

    PubMed Central

    Yu, Yifei; Li, Chun; Liu, Yi; Su, Liqin; Zhang, Yong; Cao, Linyou

    2013-01-01

    Two dimensional (2D) materials with a monolayer of atoms represent an ultimate control of material dimension in the vertical direction. Molybdenum sulfide (MoS2) monolayers, with a direct bandgap of 1.8 eV, offer an unprecedented prospect of miniaturizing semiconductor science and technology down to a truly atomic scale. Recent studies have indeed demonstrated the promise of 2D MoS2 in fields including field effect transistors, low power switches, optoelectronics, and spintronics. However, device development with 2D MoS2 has been delayed by the lack of capabilities to produce large-area, uniform, and high-quality MoS2 monolayers. Here we present a self-limiting approach that can grow high quality monolayer and few-layer MoS2 films over an area of centimeters with unprecedented uniformity and controllability. This approach is compatible with the standard fabrication process in semiconductor industry. It paves the way for the development of practical devices with 2D MoS2 and opens up new avenues for fundamental research. PMID:23689610

  6. Dual-mode operation of 2D material-base hot electron transistors.

    PubMed

    Lan, Yann-Wen; Torres, Carlos M; Zhu, Xiaodan; Qasem, Hussam; Adleman, James R; Lerner, Mitchell B; Tsai, Shin-Hung; Shi, Yumeng; Li, Lain-Jong; Yeh, Wen-Kuan; Wang, Kang L

    2016-09-01

    Vertical hot electron transistors incorporating atomically-thin 2D materials, such as graphene or MoS2, in the base region have been proposed and demonstrated in the development of electronic and optoelectronic applications. To the best of our knowledge, all previous 2D material-base hot electron transistors only considered applying a positive collector-base potential (VCB > 0) as is necessary for the typical unipolar hot-electron transistor behavior. Here we demonstrate a novel functionality, specifically a dual-mode operation, in our 2D material-base hot electron transistors (e.g. with either graphene or MoS2 in the base region) with the application of a negative collector-base potential (VCB < 0). That is, our 2D material-base hot electron transistors can operate in either a hot-electron or a reverse-current dominating mode depending upon the particular polarity of VCB. Furthermore, these devices operate at room temperature and their current gains can be dynamically tuned by varying VCB. We anticipate our multi-functional dual-mode transistors will pave the way towards the realization of novel flexible 2D material-based high-density and low-energy hot-carrier electronic applications.

  7. Dual-mode operation of 2D material-base hot electron transistors

    PubMed Central

    Lan, Yann-Wen; Torres, Jr., Carlos M.; Zhu, Xiaodan; Qasem, Hussam; Adleman, James R.; Lerner, Mitchell B.; Tsai, Shin-Hung; Shi, Yumeng; Li, Lain-Jong; Yeh, Wen-Kuan; Wang, Kang L.

    2016-01-01

    Vertical hot electron transistors incorporating atomically-thin 2D materials, such as graphene or MoS2, in the base region have been proposed and demonstrated in the development of electronic and optoelectronic applications. To the best of our knowledge, all previous 2D material-base hot electron transistors only considered applying a positive collector-base potential (VCB > 0) as is necessary for the typical unipolar hot-electron transistor behavior. Here we demonstrate a novel functionality, specifically a dual-mode operation, in our 2D material-base hot electron transistors (e.g. with either graphene or MoS2 in the base region) with the application of a negative collector-base potential (VCB < 0). That is, our 2D material-base hot electron transistors can operate in either a hot-electron or a reverse-current dominating mode depending upon the particular polarity of VCB. Furthermore, these devices operate at room temperature and their current gains can be dynamically tuned by varying VCB. We anticipate our multi-functional dual-mode transistors will pave the way towards the realization of novel flexible 2D material-based high-density and low-energy hot-carrier electronic applications. PMID:27581550

  8. Dual-mode operation of 2D material-base hot electron transistors

    NASA Astrophysics Data System (ADS)

    Lan, Yann-Wen; Torres, Carlos M., Jr.; Zhu, Xiaodan; Qasem, Hussam; Adleman, James R.; Lerner, Mitchell B.; Tsai, Shin-Hung; Shi, Yumeng; Li, Lain-Jong; Yeh, Wen-Kuan; Wang, Kang L.

    2016-09-01

    Vertical hot electron transistors incorporating atomically-thin 2D materials, such as graphene or MoS2, in the base region have been proposed and demonstrated in the development of electronic and optoelectronic applications. To the best of our knowledge, all previous 2D material-base hot electron transistors only considered applying a positive collector-base potential (VCB > 0) as is necessary for the typical unipolar hot-electron transistor behavior. Here we demonstrate a novel functionality, specifically a dual-mode operation, in our 2D material-base hot electron transistors (e.g. with either graphene or MoS2 in the base region) with the application of a negative collector-base potential (VCB < 0). That is, our 2D material-base hot electron transistors can operate in either a hot-electron or a reverse-current dominating mode depending upon the particular polarity of VCB. Furthermore, these devices operate at room temperature and their current gains can be dynamically tuned by varying VCB. We anticipate our multi-functional dual-mode transistors will pave the way towards the realization of novel flexible 2D material-based high-density and low-energy hot-carrier electronic applications.

  9. Toward epitaxially grown two-dimensional crystal hetero-structures: Single and double MoS2/graphene hetero-structures by chemical vapor depositions

    NASA Astrophysics Data System (ADS)

    Lin, Meng-Yu; Chang, Chung-En; Wang, Cheng-Hung; Su, Chen-Fung; Chen, Chi; Lee, Si-Chen; Lin, Shih-Yen

    2014-08-01

    Uniform large-size MoS2/graphene hetero-structures fabricated directly on sapphire substrates are demonstrated with layer-number controllability by chemical vapor deposition (CVD). The cross-sectional high-resolution transmission electron microscopy (HRTEM) images provide the direct evidences of layer numbers of MoS2/graphene hetero-structures. Photo-excited electron induced Fermi level shift of the graphene channel are observed on the single MoS2/graphene hetero-structure transistors. Furthermore, double hetero-structures of graphene/MoS2/graphene are achieved by CVD fabrication of graphene layers on top of the MoS2, as confirmed by the cross-sectional HRTEM. These results have paved the possibility of epitaxially grown multi-hetero-structures for practical applications.

  10. MoS2 spaser

    NASA Astrophysics Data System (ADS)

    Jayasekara, Charith; Premaratne, Malin; Gunapala, Sarath D.; Stockman, Mark I.

    2016-04-01

    We present a comprehensive analysis of a spaser made of a circular shaped highly doped molybdenum disulfide (MoS2) resonator. "Spaser" is an acronym for "surface plasmon amplification by stimulated emission of radiation"-a nanoscale source of surface plasmons generated by stimulated emission in a plasmonic resonator which receives energy nonradiatively. By considering localized surface plasmon modes, operation characteristics of the model are analysed, and tunability of the design is demonstrated. We find the optimum geometric and material parameters of the spaser that provides efficient outputs and carryout a comparative analysis with a similar circular spaser made of graphene. Owing to physical and chemical properties of MoS2 and the active medium, the proposed design delivers efficient outputs in terms of spaser mode energy, operating thresholds, Q-factor, and electric field amplitude. Lower operating thresholds and higher mode energies are notable advantages of the design. Owing to having many superior features to existing similar designs, this MoS2 spaser may be much suited for applications in nanoplasmonic devices.

  11. Manganese and chromium doping in atomically thin MoS2

    NASA Astrophysics Data System (ADS)

    Huang, Ce; Jin, Yibo; Wang, Weiyi; Tang, Lei; Song, Chaoyu; Xiu, Faxian

    2017-03-01

    Recently, two-dimensional materials have been attracting increasing attention because of their novel properties and promising applications. However, the impurity doping remains a significant challenge owing to the lack of the doping strategy in the atomically thin layers. Here we report on the chromium (Cr) and manganese (Mn) doping in atomically-thin {{{MoS}}}{{2}} crystals grown by chemical vapor deposition. The Cr/Mn doped {{{MoS}}}{{2}} samples are characterized by a peak at 1.76 and 1.79 eV in photoluminescence spectra, respectively, compared with the undoped one at 1.85 eV. The field-effect transistor (FET) devices based on the Mn doping show a higher threshold voltage than that of the pure {{{MoS}}}{{2}} while the Cr doping exhibits the opposite behavior. Importantly, the carrier concentration in these samples displays a remarkable difference arising from the doping effect, consistent with the evolution of the FET performance. The temperature-dependent conductivity measurements further demonstrate a large variation in activation energy. The successful incorporation of the Mn and Cr impurities into the monolayer {{{MoS}}}{{2}} paves the way towards the high Curie temperature two-dimensional dilute magnetic semiconductors. Project supported by the National Young 1000 Talent Plan, the Pujiang Talent Plan in Shanghai, the National Natural Science Foundation of China (Nos. 61322407, 11474058, 61674040), and the Chinese National Science Fund for Talent Training in Basic Science (No. J1103204).

  12. Doping induces large variation in the electrical properties of MoS2 monolayers

    NASA Astrophysics Data System (ADS)

    Eshun, Kwesi; Xiong, Hao D.; Yu, Sheng; Li, Qiliang

    2015-04-01

    As the devices are being shrunk into nanoscale, it is increasingly difficult, if not impossible, to precisely control the dopant position and number in low-dimensional nanomaterials. In this work, we have investigated doping effect on the electrical properties of n-type and p-type MoS2 monolayer, one of the representative two-dimensional layered semiconductors. We found that the sheet resistance of a nanoscale MoS2 monolayer exhibited large variation (>35%) as the dopant number or position changes, although the variation in band gap is relatively small. The variation increases as the size of MoS2 monolayer decreases. This variation in the doped MoS2 monolayer nanoribbons seems inevitable and will cause significant device-to-device variation that the integrated circuit cannot tolerate. This study also suggests that these two-dimensional semiconductors should be protected from unintentional or intentional doping if they are used in the transistors in future integrated circuits.

  13. Surface defect passivation of MoS2 by sulfur, selenium, and tellurium

    NASA Astrophysics Data System (ADS)

    Wang, Ying; Qi, Long; Shen, Lei; Wu, Yihong

    2016-04-01

    Few-layer MoS2 field-effect transistors often show an n-type conduction behavior due to the presence of high-density sulfur vacancies. Here, we investigated the possibility of surface defect passivation of MoS2 by sulfur treatment in (NH4)2S solution or coating with an ultrathin layer of selenium or tellurium. It was found that all three elements investigated are able to induce a p-doping effect through suppressing the residual electron concentration by an amount exceeding 0.5 × 1012 cm-2 in few-layer MoS2. Among them, the sulfur-treatment exhibits the most superior thermal stability that survives thermal annealing at temperatures ≥120 °C for at least 10 h. Tellurium exhibits the strongest p-doping effect due to electron trapping by physisorption-induced gap states near the valence band edge. On the other hand, selenium is highly volatile on MoS2; it evaporates and desorbs easily due to Joule heating during electrical measurements in vacuum. The results of first-principles calculations support the experimental observations.

  14. MOS-FET as a Current Sensor in Power Electronics Converters

    PubMed Central

    Pajer, Rok; Milanovič, Miro; Premzel, Branko; Rodič, Miran

    2015-01-01

    This paper presents a current sensing principle appropriate for use in power electronics’ converters. This current measurement principle has been developed for metal oxide semiconductor field effect transistor (MOS-FET) and is based on UDS voltage measurement. In practice, shunt resistors and Hall effect sensors are usually used for these purposes, but the presented principle has many advantages. There is no need for additional circuit elements within high current paths, causing parasitic inductances and increased production complexity. The temperature dependence of MOS-FETs conductive resistance RDS−ON is considered in order to achieve the appropriate measurement accuracy. The “MOS-FET sensor” is also accompanied by a signal acquisition electronics circuit with an appropriate frequency bandwidth. The obtained analogue signal is therefore interposed to an A-D converter for further data acquisition. In order to achieve sufficient accuracy, a temperature compensation and appropriate approximation is used (RDS−ON=RDS−ON(ϑj)). The MOS-FET sensor is calibrated according to a reference sensor based on the Hall-effect principle. The program algorithm is executed on 32-bit ARM M4 MCU, STM32F407. PMID:26213938

  15. MOS-FET as a Current Sensor in Power Electronics Converters.

    PubMed

    Pajer, Rok; Milanoviĉ, Miro; Premzel, Branko; Rodiĉ, Miran

    2015-07-24

    This paper presents a current sensing principle appropriate for use in power electronics' converters. This current measurement principle has been developed for metal oxide semiconductor field effect transistor (MOS-FET) and is based on U(DS) voltage measurement. In practice, shunt resistors and Hall effect sensors are usually used for these purposes, but the presented principle has many advantages. There is no need for additional circuit elements within high current paths, causing parasitic inductances and increased production complexity. The temperature dependence of MOS-FETs conductive resistance R(DS-ON) is considered in order to achieve the appropriate measurement accuracy. The "MOS-FET sensor" is also accompanied by a signal acquisition electronics circuit with an appropriate frequency bandwidth. The obtained analogue signal is therefore interposed to an A-D converter for further data acquisition. In order to achieve sufficient accuracy, a temperature compensation and appropriate approximation is used (R(DS-ON) = R(DS-ON)(θj)). The MOS-FET sensor is calibrated according to a reference sensor based on the Hall-effect principle. The program algorithm is executed on 32-bit ARM M4 MCU, STM32F407.

  16. Experimental detection of active defects in few layers MoS2 through random telegraphic signals analysis observed in its FET characteristics

    NASA Astrophysics Data System (ADS)

    Fang, Nan; Nagashio, Kosuke; Toriumi, Akira

    2017-03-01

    Transition-metal dichalcogenides (TMDs), such as molybdenum disulfide (MoS2), are expected to be promising for next generation device applications. The existence of sulfur vacancies formed in MoS2, however, will potentially make devices unstable and problematic. Random telegraphic signals (RTSs) have often been studied in small area Si metal-oxide-semiconductor field-effect transistors (MOSFETs) to identify the carrier capture and emission processes at defects. In this paper, we have systemically analyzed RTSs observed in atomically thin layer MoS2 FETs. Several types of RTSs have been analyzed. One is the simple on/off type of telegraphic signals, the second is multilevel telegraphic signals with a superposition of the simple signals, and the third is multilevel telegraphic signals that are correlated with each other. The last one is discussed from the viewpoint of the defect-defect interaction in MoS2 FETs with a weak screening in atomically confined two-dimensional electron-gas systems. Furthermore, the position of defects causing RTSs has also been investigated by preparing MoS2 FETs with multi-probes. The electron beam was locally irradiated to intentionally generate defects in the MoS2 channel. It is clearly demonstrated that the MoS2 channel is one of the RTS origins. RTS analysis enables us to analyze the defect dynamics of TMD devices.

  17. Chemical vapor deposition of monolayer MoS2 directly on ultrathin Al2O3 for low-power electronics

    NASA Astrophysics Data System (ADS)

    Bergeron, Hadallia; Sangwan, Vinod K.; McMorrow, Julian J.; Campbell, Gavin P.; Balla, Itamar; Liu, Xiaolong; Bedzyk, Michael J.; Marks, Tobin J.; Hersam, Mark C.

    2017-01-01

    Monolayer MoS2 has recently been identified as a promising material for high-performance electronics. However, monolayer MoS2 must be integrated with ultrathin high-κ gate dielectrics in order to realize practical low-power devices. In this letter, we report the chemical vapor deposition (CVD) of monolayer MoS2 directly on 20 nm thick Al2O3 grown by atomic layer deposition (ALD). The quality of the resulting MoS2 is characterized by a comprehensive set of microscopic and spectroscopic techniques. Furthermore, a low-temperature (200 °C) Al2O3 ALD process is developed that maintains dielectric integrity following the high-temperature CVD of MoS2 (800 °C). Field-effect transistors (FETs) derived from these MoS2/Al2O3 stacks show minimal hysteresis with a sub-threshold swing as low as ˜220 mV/decade, threshold voltages of ˜2 V, and current ION/IOFF ratio as high as ˜104, where IOFF is defined as the current at zero gate voltage as is customary for determining power consumption in complementary logic circuits. The system presented here concurrently optimizes multiple low-power electronics figures of merit while providing a transfer-free method of integrating monolayer MoS2 with ultrathin high-κ dielectrics, thus enabling a scalable pathway for enhancement-mode FETs for low-power applications.

  18. Highly efficient and stable MoS2 FETs with reversible n-doping using a dehydrated poly(vinyl-alcohol) coating.

    PubMed

    Lockhart de la Rosa, César J; Nourbakhsh, Amirhasan; Heyne, Markus; Asselberghs, Inge; Huyghebaert, Cedric; Radu, Iuliana; Heyns, Marc; De Gendt, Stefan

    2017-01-07

    Despite rapid progress in 2D molybdenum disulfide (MoS2) research in recent years, MoS2 field-effect transistors (FETs) still suffer from a high metal-to-MoS2 contact resistance and low intrinsic mobility, which are major hindrances to their future application. We report an efficient technique to dope thin-film MoS2 FETs using a poly(vinyl-alcohol) (PVA) polymeric coating. This results in a reduction of the contact resistance by up to 30% as well as a reduction in the channel resistance to 20 kΩ sq(-1). Using a dehydration process, we were able to effectively control the surface interactions between MoS2 and the more electropositive hydroxyl groups (-OH) of PVA, which provided a controllable and yet reversible increase in the charge carrier density to a value of 8.0 × 10(12) cm(-2). The non-covalent, thus non-destructive, PVA doping of MoS2 increases the carrier concentration without degrading the mobility, which shows a monotonic increase while enhancing the doping effect. The PVA doping technique is then exploited to create heavily doped access regions to the intrinsic MoS2 channel, which yields 200% increase of the ON-state source-drain current. This establishes PVA doping as an effective approach to enhance the transport properties of MoS2 FETs for a variety of applications.

  19. Spin-dependent thermoelectric effects in Fe-C6 doped monolayer MoS2.

    PubMed

    Zhu, Lin; Zou, Fei; Gao, Guoying; Yao, Kailun

    2017-03-29

    By using the non-equilibrium Green's function with density functional theory, we have studied the thermal spin transport properties of Fe-C6 cluster doped monolayer MoS2. The results show that the device has a perfect Seebeck effect under temperature difference without gate voltage or bias voltage. Moreover, we also find the thermal colossal magnetoresistance effect, which is as high as 10(7)%. The competition between spin up electrons and spin down holes of the parallel spin configuration leads to peculiar behavior of colossal magnetoresistance and thermo-current, which is essential for the design of thermal transistors. These results are useful in future MoS2-based multifunctional spin caloritronic devices.

  20. Oxidation of gallium arsenide in a plasma multipole device. Study of the MOS structures obtained

    NASA Technical Reports Server (NTRS)

    Gourrier, S.; Mircea, A.; Simondet, F.

    1980-01-01

    The oxygen plasma oxidation of GaAs was studied in order to obtain extremely high frequency responses with MOS devices. In the multipole system a homogeneous oxygen plasma of high density can easily be obtained in a large volume. This system is thus convenient for the study of plasma oxidation of GaAs. The electrical properties of the MOS diodes obtained in this way are controlled by interface states, located mostly in the upper half of the band gap where densities in the 10 to the 13th power/(sq cm) (eV) range can be estimated. Despite these interface states the possibility of fabricating MOSFET transistors working mostly in the depletion mode for a higher frequency cut-off still exists.

  1. Chemical free device fabrication of two dimensional van der Waals materials based transistors by using one-off stamping

    NASA Astrophysics Data System (ADS)

    Lee, Young Tack; Choi, Won Kook; Hwang, Do Kyung

    2016-06-01

    We report on a chemical free one-off imprinting method to fabricate two dimensional (2D) van der Waals (vdWs) materials based transistors. Such one-off imprinting technique is the simplest and effective way to prevent unintentional chemical reaction or damage of 2D vdWs active channel during device fabrication process. 2D MoS2 nanosheets based transistors with a hexagonal-boron-nitride (h-BN) passivation layer, prepared by one-off imprinting, show negligible variations of transfer characteristics after chemical vapor deposition process. In addition, this method enables the fabrication of all 2D MoS2 transistors consisting of h-BN gate insulator, and graphene source/drain and gate electrodes without any chemical damage.

  2. Improved integration of ultra-thin high-k dielectrics in few-layer MoS2 FET by remote forming gas plasma pretreatment

    NASA Astrophysics Data System (ADS)

    Wang, Xiao; Zhang, Tian-Bao; Yang, Wen; Zhu, Hao; Chen, Lin; Sun, Qing-Qing; Zhang, David Wei

    2017-01-01

    The effective and high-quality integration of high-k dielectrics on two-dimensional (2D) crystals is essential to the device structure engineering and performance improvement of field-effect transistor (FET) based on the 2D semiconductors. We report a 2D MoS2 transistor with ultra-thin Al2O3 top-gate dielectric (6.1 nm) and extremely low leakage current. Remote forming gas plasma pretreatment was carried out prior to the atomic layer deposition, providing nucleation sites with the physically adsorbed ions on the MoS2 surface. The top gate MoS2 FET exhibited excellent electrical performance, including high on/off current ratio over 109, subthreshold swing of 85 mV/decade and field-effect mobility of 45.03 cm2/V s. Top gate leakage current less than 0.08 pA/μm2 at 4 MV/cm has been obtained, which is the smallest compared with the reported top-gated MoS2 transistors. Such an optimized integration of high-k dielectric in 2D semiconductor FET with enhanced performance is very attractive, and it paves the way towards the realization of more advanced 2D nanoelectronic devices and integrated circuits.

  3. Single transistor latch phenomenon in junctionless transistors

    NASA Astrophysics Data System (ADS)

    Singh Parihar, Mukta; Ghosh, Dipankar; Kranti, Abhinav

    2013-05-01

    In this work, we report on the single transistor latch phenomenon in junctionless transistors. In the latch condition, the device is unable to turn-off despite a reduction in gate bias. It is shown that impact ionization induced latch condition can occur due to an increase in drain bias, silicon film thickness, gate oxide thickness, and doping concentration. The latch phenomenon is explained in terms of generation-recombination rates, electrostatic potential, electric field distribution and product of current density and electric field (J.E). As latch condition is undesirable for dynamic memory applications, the work highlights the significance of (J.E) as a performance metric to avoid the junctionless transistor being driven into the latch mode.

  4. The Integration of Sub-10 nm Gate Oxide on MoS2 with Ultra Low Leakage and Enhanced Mobility

    PubMed Central

    Yang, Wen; Sun, Qing-Qing; Geng, Yang; Chen, Lin; Zhou, Peng; Ding, Shi-Jin; Zhang, David Wei

    2015-01-01

    The integration of ultra-thin gate oxide, especially at sub-10 nm region, is one of the principle problems in MoS2 based transistors. In this work, we demonstrate sub-10 nm uniform deposition of Al2O3 on MoS2 basal plane by applying ultra-low energy remote oxygen plasma pretreatment prior to atomic layer deposition. It is demonstrated that oxygen species in ultra-low energy plasma are physically adsorbed on MoS2 surfaces without making the flakes oxidized, and is capable of benefiting the mobility of MoS2 flake. Based on this method, top-gated MoS2 transistor with ultrathin Al2O3 dielectric is fabricated. With 6.6 nm Al2O3 as gate dielectric, the device shows gate leakage about 0.1 pA/μm2 at 4.5 MV/cm which is much lower than previous reports. Besides, the top-gated device shows great on/off ratio of over 108, subthreshold swing (SS) of 101 mV/dec and a mobility of 28 cm2/Vs. With further investigations and careful optimizations, this method can play an important role in future nanoelectronics. PMID:26146017

  5. Vibrational and optical properties of MoS2: From monolayer to bulk

    NASA Astrophysics Data System (ADS)

    Molina-Sánchez, Alejandro; Hummer, Kerstin; Wirtz, Ludger

    2015-12-01

    Molybdenum disulfide, MoS2, has recently gained considerable attention as a layered material where neighboring layers are only weakly interacting and can easily slide against each other. Therefore, mechanical exfoliation allows the fabrication of single and multi-layers and opens the possibility to generate atomically thin crystals with outstanding properties. In contrast to graphene, it has an optical gap of ~1.9 eV. This makes it a prominent candidate for transistor and opto-electronic applications. Single-layer MoS2 exhibits remarkably different physical properties compared to bulk MoS2 due to the absence of interlayer hybridization. For instance, while the band gap of bulk and multi-layer MoS2 is indirect, it becomes direct with decreasing number of layers. In this review, we analyze from a theoretical point of view the electronic, optical, and vibrational properties of single-layer, few-layer and bulk MoS2. In particular, we focus on the effects of spin-orbit interaction, number of layers, and applied tensile strain on the vibrational and optical properties. We examine the results obtained by different methodologies, mainly ab initio approaches. We also discuss which approximations are suitable for MoS2 and layered materials. The effect of external strain on the band gap of single-layer MoS2 and the crossover from indirect to direct band gap is investigated. We analyze the excitonic effects on the absorption spectra. The main features, such as the double peak at the absorption threshold and the high-energy exciton are presented. Furthermore, we report on the the phonon dispersion relations of single-layer, few-layer and bulk MoS2. Based on the latter, we explain the behavior of the Raman-active A1g and E2g1 modes as a function of the number of layers. Finally, we compare theoretical and experimental results of Raman, photoluminescence, and optical-absorption spectroscopy.

  6. Plasmonic Gold Nanorods Coverage Influence on Enhancement of the Photoluminescence of Two-Dimensional MoS2 Monolayer

    PubMed Central

    Lee, Kevin C. J.; Chen, Yi-Huan; Lin, Hsiang-Yu; Cheng, Chia-Chin; Chen, Pei-Ying; Wu, Ting-Yi; Shih, Min-Hsiung; Wei, Kung-Hwa; Li, Lain-Jong; Chang, Chien-Wen

    2015-01-01

    The 2-D transition metal dichalcogenide (TMD) semiconductors, has received great attention due to its excellent optical and electronic properties and potential applications in field-effect transistors, light emitting and sensing devices. Recently surface plasmon enhanced photoluminescence (PL) of the weak 2-D TMD atomic layers was developed to realize the potential optoelectronic devices. However, we noticed that the enhancement would not increase monotonically with increasing of metal plasmonic objects and the emission drop after the certain coverage. This study presents the optimized PL enhancement of a monolayer MoS2 in the presence of gold (Au) nanorods. A localized surface plasmon wave of Au nanorods that generated around the monolayer MoS2 can provide resonance wavelength overlapping with that of the MoS2 gain spectrum. These spatial and spectral overlapping between the localized surface plasmon polariton waves and that from MoS2 emission drastically enhanced the light emission from the MoS2 monolayer. We gave a simple model and physical interpretations to explain the phenomena. The plasmonic Au nanostructures approach provides a valuable avenue to enhancing the emitting efficiency of the 2-D nano-materials and their devices for the future optoelectronic devices and systems. PMID:26576041

  7. Synthesis and characterization of large-area and continuous MoS2 atomic layers by RF magnetron sputtering.

    PubMed

    Hussain, Sajjad; Shehzad, Muhammad Arslan; Vikraman, Dhanasekaran; Khan, Muhammad Farooq; Singh, Jai; Choi, Dong-Chul; Seo, Yongho; Eom, Jonghwa; Lee, Wan-Gyu; Jung, Jongwan

    2016-02-21

    In this article, we report layer-controlled, continuous and large-area molydenum sulfide (MoS2) growth onto a SiO2/Si substrate by RF sputtering combined with sulfurization. A two-step process was employed to synthesize MoS2 films. In the first step, an atomically thin MoO3 film was deposited by RF magnetron sputtering at 300 °C. Subsequently, the as-sputtered MoO3 film was further subjected to post-annealing and sulfurization processes at 650 °C for 1 hour. It was observed that the number of layers of MoS2 can be controlled by adjusting the sputtering time. The fabricated MoS2 transistors exhibited high mobility values of ∼21 cm(2) V(-1) s(-1) (bilayer) and ∼25 cm(2) V(-1) s(-1) (trilayer), on/off ratios in the range of ∼10(7) (bilayer) and 10(4)-10(5) (trilayer), respectively. We believe that our proposed paradigm can start a new method for the growth of MoS2 in future electronics and optoelectronics applications.

  8. Polarity control in WSe2 double-gate transistors

    NASA Astrophysics Data System (ADS)

    Resta, Giovanni V.; Sutar, Surajit; Balaji, Yashwanth; Lin, Dennis; Raghavan, Praveen; Radu, Iuliana; Catthoor, Francky; Thean, Aaron; Gaillardon, Pierre-Emmanuel; de Micheli, Giovanni

    2016-07-01

    As scaling of conventional silicon-based electronics is reaching its ultimate limit, considerable effort has been devoted to find new materials and new device concepts that could ultimately outperform standard silicon transistors. In this perspective two-dimensional transition metal dichalcogenides, such as MoS2 and WSe2, have recently attracted considerable interest thanks to their electrical properties. Here, we report the first experimental demonstration of a doping-free, polarity-controllable device fabricated on few-layer WSe2. We show how modulation of the Schottky barriers at drain and source by a separate gate, named program gate, can enable the selection of the carriers injected in the channel, and achieved controllable polarity behaviour with ON/OFF current ratios >106 for both electrons and holes conduction. Polarity-controlled WSe2 transistors enable the design of compact logic gates, leading to higher computational densities in 2D-flatronics.

  9. Theoretic analysis on electric conductance of nano-wire transistors

    NASA Astrophysics Data System (ADS)

    Tsai, N.-C.; Chiang, Y.-R.; Hsu, S.-L.

    2010-01-01

    By employing the commercial software nanoMos and Vienna ab Initio Simulation Package ( VASP), the performance of nano-wire field-effect transistors is investigated. In this paper, the Density-Gradient Model (DG Model) is used to describe the carrier transport behavior of the nano-wire transistor under quantum effects. The analysis of the drain current with respect to channel length, body dielectric constant and gate contact work function is presented. In addition, Fermi energy and DOS (Density of State) are introduced to explore the relative stability of carrier transport and electrical conductance for the silicon crystal with dopants. Finally, how the roughness of the surface of the silicon-based crystal is affected by dopants and their allocation can be illuminated by a few broken bonds between atoms near the skin of the crystal.

  10. Polarity control in WSe2 double-gate transistors.

    PubMed

    Resta, Giovanni V; Sutar, Surajit; Balaji, Yashwanth; Lin, Dennis; Raghavan, Praveen; Radu, Iuliana; Catthoor, Francky; Thean, Aaron; Gaillardon, Pierre-Emmanuel; de Micheli, Giovanni

    2016-07-08

    As scaling of conventional silicon-based electronics is reaching its ultimate limit, considerable effort has been devoted to find new materials and new device concepts that could ultimately outperform standard silicon transistors. In this perspective two-dimensional transition metal dichalcogenides, such as MoS2 and WSe2, have recently attracted considerable interest thanks to their electrical properties. Here, we report the first experimental demonstration of a doping-free, polarity-controllable device fabricated on few-layer WSe2. We show how modulation of the Schottky barriers at drain and source by a separate gate, named program gate, can enable the selection of the carriers injected in the channel, and achieved controllable polarity behaviour with ON/OFF current ratios >10(6) for both electrons and holes conduction. Polarity-controlled WSe2 transistors enable the design of compact logic gates, leading to higher computational densities in 2D-flatronics.

  11. Polarity control in WSe2 double-gate transistors

    PubMed Central

    Resta, Giovanni V.; Sutar, Surajit; Balaji, Yashwanth; Lin, Dennis; Raghavan, Praveen; Radu, Iuliana; Catthoor, Francky; Thean, Aaron; Gaillardon, Pierre-Emmanuel; de Micheli, Giovanni

    2016-01-01

    As scaling of conventional silicon-based electronics is reaching its ultimate limit, considerable effort has been devoted to find new materials and new device concepts that could ultimately outperform standard silicon transistors. In this perspective two-dimensional transition metal dichalcogenides, such as MoS2 and WSe2, have recently attracted considerable interest thanks to their electrical properties. Here, we report the first experimental demonstration of a doping-free, polarity-controllable device fabricated on few-layer WSe2. We show how modulation of the Schottky barriers at drain and source by a separate gate, named program gate, can enable the selection of the carriers injected in the channel, and achieved controllable polarity behaviour with ON/OFF current ratios >106 for both electrons and holes conduction. Polarity-controlled WSe2 transistors enable the design of compact logic gates, leading to higher computational densities in 2D-flatronics. PMID:27390014

  12. A highly sensitive, highly transparent, gel-gated MoS2 phototransistor on biodegradable nanopaper

    NASA Astrophysics Data System (ADS)

    Zhang, Qing; Bao, Wenzhong; Gong, Amy; Gong, Tao; Ma, Dakang; Wan, Jiayu; Dai, Jiaqi; Munday, Jeremy N.; He-Hau, Jr.; Hu, Liangbing; Zhang, Daihua

    2016-07-01

    Transition metal dichalcogenides hold great promise for a variety of novel electrical, optical and mechanical devices and applications. Among them, molybdenum disulphide (MoS2) is gaining increasing attention as gate dielectrics and semiconductive channels for high-performance field effect transistors. Here we report on the first MoS2 phototransistor built on a flexible, transparent and biodegradable substrate with an electrolyte gate dielectric. We have carried out systematic studies on its electrical and optoelectronic properties. The MoS2 phototransistor exhibited an excellent photoresponsivity of ~1.5 kA W-1, about two times higher compared to typical back-gated devices reported in previous studies. The device is highly transparent at the same time with an average optical transmittance of 82%. Successful fabrication of phototransistors on flexible cellulose nanopaper with excellent performance and transparency suggests that it is feasible to achieve an ecofriendly and biodegradable phototransistor with great photoresponsivity, broad spectral range and durable flexibility.Transition metal dichalcogenides hold great promise for a variety of novel electrical, optical and mechanical devices and applications. Among them, molybdenum disulphide (MoS2) is gaining increasing attention as gate dielectrics and semiconductive channels for high-performance field effect transistors. Here we report on the first MoS2 phototransistor built on a flexible, transparent and biodegradable substrate with an electrolyte gate dielectric. We have carried out systematic studies on its electrical and optoelectronic properties. The MoS2 phototransistor exhibited an excellent photoresponsivity of ~1.5 kA W-1, about two times higher compared to typical back-gated devices reported in previous studies. The device is highly transparent at the same time with an average optical transmittance of 82%. Successful fabrication of phototransistors on flexible cellulose nanopaper with excellent

  13. Enhancement of photodetection based on perovskite/MoS2 hybrid thin film transistor

    NASA Astrophysics Data System (ADS)

    Liu, Fengjing; Wang, Jiawei; Wang, Liang; Cai, Xiaoyong; Jiang, Chao; Wang, Gongtang

    2017-03-01

    Perovskite/MoS2 hybrid thin film transistor photodetectors consist of few-layered MoS2 and CH3NH3PbI3 film with various thickness prepared by two-step vacuum deposition. By implementing perovskite CH3NH3PbI3 film onto the MoS2 flake, the perovskite/MoS2 hybrid photodetector exhibited a photoresponsivity of 104 A/W and fast response time of about 40 ms. Improvement of photodetection performance is attributed to the balance between light absorption in the perovskite layer and an effective transfer of photogenerated carriers from perovskite entering the MoS2 channel. This work may provide guidance to develop high-performance hybrid structure optoelectronic devices. Project supported by the National Natural Science Foundation of China (Nos. 11374070, 61327009 214320051) and the Strategic Priority Research Program of the Chinese Academy of Sciences (No. XDA09040201).

  14. Novel Field-Effect Schottky Barrier Transistors Based on Graphene-MoS2 Heterojunctions

    PubMed Central

    Tian, He; Tan, Zhen; Wu, Can; Wang, Xiaomu; Mohammad, Mohammad Ali; Xie, Dan; Yang, Yi; Wang, Jing; Li, Lain-Jong; Xu, Jun; Ren, Tian-Ling

    2014-01-01

    Recently, two-dimensional materials such as molybdenum disulphide (MoS2) have been demonstrated to realize field effect transistors (FET) with a large current on-off ratio. However, the carrier mobility in backgate MoS2 FET is rather low (typically 0.5–20 cm2/V·s). Here, we report a novel field-effect Schottky barrier transistors (FESBT) based on graphene-MoS2 heterojunction (GMH), where the characteristics of high mobility from graphene and high on-off ratio from MoS2 are properly balanced in the novel transistors. Large modulation on the device current (on/off ratio of 105) is achieved by adjusting the backgate (through 300 nm SiO2) voltage to modulate the graphene-MoS2 Schottky barrier. Moreover, the field effective mobility of the FESBT is up to 58.7 cm2/V·s. Our theoretical analysis shows that if the thickness of oxide is further reduced, a subthreshold swing (SS) of 40 mV/decade can be maintained within three orders of drain current at room temperature. This provides an opportunity to overcome the limitation of 60 mV/decade for conventional CMOS devices. The FESBT implemented with a high on-off ratio, a relatively high mobility and a low subthreshold promises low-voltage and low-power applications for future electronics. PMID:25109609

  15. Few-layer molybdenum disulfide transistors and circuits for high-speed flexible electronics

    NASA Astrophysics Data System (ADS)

    Cheng, Rui; Jiang, Shan; Chen, Yu; Liu, Yuan; Weiss, Nathan; Cheng, Hung-Chieh; Wu, Hao; Huang, Yu; Duan, Xiangfeng

    2014-10-01

    Two-dimensional layered materials, such as molybdenum disulfide, are emerging as an exciting material system for future electronics due to their unique electronic properties and atomically thin geometry. Here we report a systematic investigation of MoS2 transistors with optimized contact and device geometry, to achieve self-aligned devices with performance including an intrinsic gain over 30, an intrinsic cut-off frequency fT up to 42 GHz and a maximum oscillation frequency fMAX up to 50 GHz, exceeding the reported values for MoS2 transistors to date (fT~0.9 GHz, fMAX~1 GHz). Our results show that logic inverters or radio frequency amplifiers can be formed by integrating multiple MoS2 transistors on quartz or flexible substrates with voltage gain in the gigahertz regime. This study demonstrates the potential of two-dimensional layered semiconductors for high-speed flexible electronics.

  16. Few-layer molybdenum disulfide transistors and circuits for high-speed flexible electronics.

    PubMed

    Cheng, Rui; Jiang, Shan; Chen, Yu; Liu, Yuan; Weiss, Nathan; Cheng, Hung-Chieh; Wu, Hao; Huang, Yu; Duan, Xiangfeng

    2014-10-08

    Two-dimensional layered materials, such as molybdenum disulfide, are emerging as an exciting material system for future electronics due to their unique electronic properties and atomically thin geometry. Here we report a systematic investigation of MoS2 transistors with optimized contact and device geometry, to achieve self-aligned devices with performance including an intrinsic gain over 30, an intrinsic cut-off frequency fT up to 42 GHz and a maximum oscillation frequency fMAX up to 50 GHz, exceeding the reported values for MoS2 transistors to date (fT~0.9 GHz, fMAX~1 GHz). Our results show that logic inverters or radio frequency amplifiers can be formed by integrating multiple MoS2 transistors on quartz or flexible substrates with voltage gain in the gigahertz regime. This study demonstrates the potential of two-dimensional layered semiconductors for high-speed flexible electronics.

  17. High Power Switching Transistor

    NASA Technical Reports Server (NTRS)

    Hower, P. L.; Kao, Y. C.; Carnahan, D. C.

    1983-01-01

    Improved switching transistors handle 400-A peak currents and up to 1,200 V. Using large diameter silicon wafers with twice effective area as D60T, form basis for D7 family of power switching transistors. Package includes npn wafer, emitter preform, and base-contact insert. Applications are: 25to 50-kilowatt high-frequency dc/dc inverters, VSCF converters, and motor controllers for electrical vehicles.

  18. A TRANSISTORIZED RELAY SERVO.

    DTIC Science & Technology

    DC motor is achieved with standard power transistors and a simple transistorized preamplifier, A permanent magnet, DC motor is used as the test vehicle to illustrate the feasibility of control without an amplidyne or mechanical relay. The ’bang-bang’, capability of the controller to operate as a near-ideal ’relay’ is emphasized. The inherent flexibility allowed in selecting the switching characteristics is also demonstrated. The discussion points toward practical application and stresses the analysis of the switching

  19. Tunneling in thin MOS structures

    NASA Technical Reports Server (NTRS)

    Maserjian, J.

    1974-01-01

    Recent results on tunneling in thin MOS structures are described. Thermally grown SiO2 films in the thickness range of 22-40 A have been shown to be effectively uniform on an atomic scale and exhibit an extremely abrupt oxide-silicon interface. Resonant reflections are observed at this interface for Fowler-Nordheim tunneling and are shown to agree with the exact theory for a trapezoidal barrier. Tunneling at lower fields is consistent with elastic tunneling into the silicon direct conduction band and, at still lower fields, inelastic tunneling into the indirect conduction band. Approximate dispersion relations are obtained over portions of the silicon-dioxide energy gap and conduction band.

  20. Transistor-based interface circuitry

    DOEpatents

    Taubman, Matthew S.

    2007-02-13

    Among the embodiments of the present invention is an apparatus that includes a transistor, a servo device, and a current source. The servo device is operable to provide a common base mode of operation of the transistor by maintaining an approximately constant voltage level at the transistor base. The current source is operable to provide a bias current to the transistor. A first device provides an input signal to an electrical node positioned between the emitter of the transistor and the current source. A second device receives an output signal from the collector of the transistor.

  1. Transistor-based interface circuitry

    DOEpatents

    Taubman, Matthew S.

    2004-02-24

    Among the embodiments of the present invention is an apparatus that includes a transistor, a servo device, and a current source. The servo device is operable to provide a common base mode of operation of the transistor by maintaining an approximately constant voltage level at the transistor base. The current source is operable to provide a bias current to the transistor. A first device provides an input signal to an electrical node positioned between the emitter of the transistor and the current source. A second device receives an output signal from the collector of the transistor.

  2. Preventing Simultaneous Conduction In Switching Transistors

    NASA Technical Reports Server (NTRS)

    Mclyman, William T.

    1990-01-01

    High voltage spikes and electromagnetic interference suppressed. Power-supply circuit including two switching transistors easily modified to prevent simultaneous conduction by both transistors during switching intervals. Diode connected between collector of each transistor and driving circuit for opposite transistor suppresses driving signal to transistor being turned on until transistor being turned off ceases to carry current.

  3. Characteristics control of room-temperature operating single electron transistor with floating gate by charge pump circuit

    NASA Astrophysics Data System (ADS)

    Nozue, Motoki; Suzuki, Ryota; Nomura, Hirotoshi; Saraya, Takuya; Hiramoto, Toshiro

    2013-10-01

    A single electron transistor (SET) with floating gate, which has a non-volatile memory effect, is successfully integrated with a charge pump circuit that consists of conventional MOS circuits on the same chip. By applying high voltage generated by the charge pump circuit to SET with floating gate, characteristics control of the Coulomb blockade oscillation is demonstrated at room temperature for the first time. This attempt will open a new path of adding new functionality to conventional MOS circuits by integration with so-called "Beyond CMOS" devices.

  4. C-MOS array design techniques

    NASA Technical Reports Server (NTRS)

    Feller, A.

    1978-01-01

    The entire complement of standard cells and components, except for the set-reset flip-flop, was completed. Two levels of checking were performed on each device. Logic cells and topological layout are described. All the related computer programs were coded and one level of debugging was completed. The logic for the test chip was modified and updated. This test chip served as the first test vehicle to exercise the standard cell complementary MOS(C-MOS) automatic artwork generation capability.

  5. Strain Gated Bilayer Molybdenum Disulfide Field Effect Transistor with Edge Contacts.

    PubMed

    Chai, Yu; Su, Shanshan; Yan, Dong; Ozkan, Mihrimah; Lake, Roger; Ozkan, Cengiz S

    2017-02-10

    Silicon nitride stress capping layer is an industry proven technique for increasing electron mobility and drive currents in n-channel silicon MOSFETs. Herein, the strain induced by silicon nitride is firstly characterized through the changes in photoluminescence and Raman spectra of a bare bilayer MoS2 (Molybdenum disulfide). To make an analogy of the strain-gated silicon MOSFET, strain is exerted to a bilayer MoS2 field effect transistor (FET) through deposition of a silicon nitride stress liner that warps both the gate and the source-drain area. Helium plasma etched MoS2 layers for edge contacts. Current on/off ratio and other performance metrics are measured and compared as the FETs evolve from back-gated, to top-gated and finally, to strain-gated configurations. While the indirect band gap of bilayer MoS2 at 0% strain is 1.25 eV, the band gap decreases as the tensile strain increases on an average of ~100 meV per 1% tensile strain, and the decrease in band gap is mainly due to lowering the conduction band at K point. Comparing top- and strain-gated structures, we find a 58% increase in electron mobility and 46% increase in on-current magnitude, signalling a benign effect of tensile strain on the carrier transport properties of MoS2.

  6. Strain Gated Bilayer Molybdenum Disulfide Field Effect Transistor with Edge Contacts

    NASA Astrophysics Data System (ADS)

    Chai, Yu; Su, Shanshan; Yan, Dong; Ozkan, Mihrimah; Lake, Roger; Ozkan, Cengiz S.

    2017-02-01

    Silicon nitride stress capping layer is an industry proven technique for increasing electron mobility and drive currents in n-channel silicon MOSFETs. Herein, the strain induced by silicon nitride is firstly characterized through the changes in photoluminescence and Raman spectra of a bare bilayer MoS2 (Molybdenum disulfide). To make an analogy of the strain-gated silicon MOSFET, strain is exerted to a bilayer MoS2 field effect transistor (FET) through deposition of a silicon nitride stress liner that warps both the gate and the source-drain area. Helium plasma etched MoS2 layers for edge contacts. Current on/off ratio and other performance metrics are measured and compared as the FETs evolve from back-gated, to top-gated and finally, to strain-gated configurations. While the indirect band gap of bilayer MoS2 at 0% strain is 1.25 eV, the band gap decreases as the tensile strain increases on an average of ~100 meV per 1% tensile strain, and the decrease in band gap is mainly due to lowering the conduction band at K point. Comparing top- and strain-gated structures, we find a 58% increase in electron mobility and 46% increase in on-current magnitude, signalling a benign effect of tensile strain on the carrier transport properties of MoS2.

  7. Strain Gated Bilayer Molybdenum Disulfide Field Effect Transistor with Edge Contacts

    PubMed Central

    Chai, Yu; Su, Shanshan; Yan, Dong; Ozkan, Mihrimah; Lake, Roger; Ozkan, Cengiz S.

    2017-01-01

    Silicon nitride stress capping layer is an industry proven technique for increasing electron mobility and drive currents in n-channel silicon MOSFETs. Herein, the strain induced by silicon nitride is firstly characterized through the changes in photoluminescence and Raman spectra of a bare bilayer MoS2 (Molybdenum disulfide). To make an analogy of the strain-gated silicon MOSFET, strain is exerted to a bilayer MoS2 field effect transistor (FET) through deposition of a silicon nitride stress liner that warps both the gate and the source-drain area. Helium plasma etched MoS2 layers for edge contacts. Current on/off ratio and other performance metrics are measured and compared as the FETs evolve from back-gated, to top-gated and finally, to strain-gated configurations. While the indirect band gap of bilayer MoS2 at 0% strain is 1.25 eV, the band gap decreases as the tensile strain increases on an average of ~100 meV per 1% tensile strain, and the decrease in band gap is mainly due to lowering the conduction band at K point. Comparing top- and strain-gated structures, we find a 58% increase in electron mobility and 46% increase in on-current magnitude, signalling a benign effect of tensile strain on the carrier transport properties of MoS2. PMID:28186113

  8. Schottky Barrier Thin Film Transistor (SB-TFT) on low-temperature polycrystalline silicon

    NASA Astrophysics Data System (ADS)

    De Iacovo, A.; Ferrone, A.; Colace, L.; Minotti, A.; Maiolo, L.; Pecora, A.

    2016-12-01

    We report on the fabrication and characterization of Schottky barrier transistors on polycrystalline silicon. The transistors were realized exploiting Cr-Si and Ti-Si Schottky barrier with a low thermal budget process, compatible with polymeric, ultraflexible substrates. We obtained devices with threshold voltages as low as 1.7 V (for n channel) and 4 V (for p channel) with channel lengths ranging from 2 to 40 μm. Resulting on/off ratios are as high as 5 · 103. The devices showed threshold voltages and subthreshold slopes comparable with already published N- and P-MOS devices realized with the same process on polyimide substrates thus representing a cheaper and scalable alternative to ultraflexible transistors with doped source and drain.

  9. Influence of stoichiometry on the optical and electrical properties of chemical vapor deposition derived MoS2.

    PubMed

    Kim, In Soo; Sangwan, Vinod K; Jariwala, Deep; Wood, Joshua D; Park, Spencer; Chen, Kan-Sheng; Shi, Fengyuan; Ruiz-Zepeda, Francisco; Ponce, Arturo; Jose-Yacaman, Miguel; Dravid, Vinayak P; Marks, Tobin J; Hersam, Mark C; Lauhon, Lincoln J

    2014-10-28

    Ultrathin transition metal dichalcogenides (TMDCs) of Mo and W show great potential for digital electronics and optoelectronic applications. Whereas early studies were limited to mechanically exfoliated flakes, the large-area synthesis of 2D TMDCs has now been realized by chemical vapor deposition (CVD) based on a sulfurization reaction. The optoelectronic properties of CVD grown monolayer MoS2 have been intensively investigated, but the influence of stoichiometry on the electrical and optical properties has been largely overlooked. Here we systematically vary the stoichiometry of monolayer MoS2 during CVD via controlled sulfurization and investigate the associated changes in photoluminescence and electrical properties. X-ray photoelectron spectroscopy is employed to measure relative variations in stoichiometry and the persistence of MoOx species. As MoS2-δ is reduced (increasing δ), the field-effect mobility of monolayer transistors increases while the photoluminescence yield becomes nonuniform. Devices fabricated from monolayers with the lowest sulfur content have negligible hysteresis and a threshold voltage of ∼ 0 V. We conclude that the electrical and optical properties of monolayer MoS2 crystals can be tuned via stoichiometry engineering to meet the requirements of various applications.

  10. Influence of Stoichiometry on the Optical and Electrical Properties of Chemical Vapor Deposition Derived MoS2

    PubMed Central

    2015-01-01

    Ultrathin transition metal dichalcogenides (TMDCs) of Mo and W show great potential for digital electronics and optoelectronic applications. Whereas early studies were limited to mechanically exfoliated flakes, the large-area synthesis of 2D TMDCs has now been realized by chemical vapor deposition (CVD) based on a sulfurization reaction. The optoelectronic properties of CVD grown monolayer MoS2 have been intensively investigated, but the influence of stoichiometry on the electrical and optical properties has been largely overlooked. Here we systematically vary the stoichiometry of monolayer MoS2 during CVD via controlled sulfurization and investigate the associated changes in photoluminescence and electrical properties. X-ray photoelectron spectroscopy is employed to measure relative variations in stoichiometry and the persistence of MoOx species. As MoS2−δ is reduced (increasing δ), the field-effect mobility of monolayer transistors increases while the photoluminescence yield becomes nonuniform. Devices fabricated from monolayers with the lowest sulfur content have negligible hysteresis and a threshold voltage of ∼0 V. We conclude that the electrical and optical properties of monolayer MoS2 crystals can be tuned via stoichiometry engineering to meet the requirements of various applications. PMID:25223821

  11. Quantum Thermal Transistor.

    PubMed

    Joulain, Karl; Drevillon, Jérémie; Ezzahri, Younès; Ordonez-Miranda, Jose

    2016-05-20

    We demonstrate that a thermal transistor can be made up with a quantum system of three interacting subsystems, coupled to a thermal reservoir each. This thermal transistor is analogous to an electronic bipolar one with the ability to control the thermal currents at the collector and at the emitter with the imposed thermal current at the base. This is achieved by determining the heat fluxes by means of the strong-coupling formalism. For the case of three interacting spins, in which one of them is coupled to the other two, that are not directly coupled, it is shown that high amplification can be obtained in a wide range of energy parameters and temperatures. The proposed quantum transistor could, in principle, be used to develop devices such as a thermal modulator and a thermal amplifier in nanosystems.

  12. Quantum Thermal Transistor

    NASA Astrophysics Data System (ADS)

    Joulain, Karl; Drevillon, Jérémie; Ezzahri, Younès; Ordonez-Miranda, Jose

    2016-05-01

    We demonstrate that a thermal transistor can be made up with a quantum system of three interacting subsystems, coupled to a thermal reservoir each. This thermal transistor is analogous to an electronic bipolar one with the ability to control the thermal currents at the collector and at the emitter with the imposed thermal current at the base. This is achieved by determining the heat fluxes by means of the strong-coupling formalism. For the case of three interacting spins, in which one of them is coupled to the other two, that are not directly coupled, it is shown that high amplification can be obtained in a wide range of energy parameters and temperatures. The proposed quantum transistor could, in principle, be used to develop devices such as a thermal modulator and a thermal amplifier in nanosystems.

  13. Metallic field effect transistors

    NASA Astrophysics Data System (ADS)

    Farooq, Hassan

    This thesis investigates the principle of operation behind metallic-field effect transistors (METFETs) through a systematic study of atomistic simulations performed on metallic bulk, nanowire and transistor structures. In particular, density functional theory (DFT) and non-equilibrium green's function (NEGF) based models were used to study the effect on the bandstructure and density of states of highly scaled metallic nanowires with varying parameters such as crystal orientation, cross-sectional area, and applied external bias. Similarly, the effect of varying similar parameters on the transfer and output characteristics of highly scaled metallic transistors was studied. Furthermore, oxide interfaces with metallic channels were investigated. The simulation results show that a gold METFET in the [100] crystal orientation has an I ON /IOFF ratio of 41, ION of 29.5microA and fT of 6.7THz, outperforming similarly sized MOSFETs as a promising alternative for use in high-frequency circuits.

  14. MoS2 based dual input logic AND gate

    NASA Astrophysics Data System (ADS)

    Martinez, Luis M.; Pinto, Nicholas J.; Naylor, Carl H.; Johnson, A. T. Charlie

    2016-12-01

    Crystalline monolayers of CVD MoS2 are used as the active semiconducting channel in a split-gate field effect transistor. The device demonstrates logic AND functionality that is controlled by independently addressing each gate terminal with ±10V. When +10V was simultaneously applied to both gates, the device was conductive (ON), while any other combination of gate voltages rendered the device resistive (OFF). The ON/OFF ratio of the device was ˜ 35 and the charge mobility using silicon nitride as the gate dielectric was 1.2cm2/V-s and 0.1cm2/V-s in the ON and OFF states respectively. Clear discrimination between the two states was observed when a simple circuit containing a load resistor was used to test the device logic AND functionality at 10Hz. One advantage is that split gate technology can reduce the number of devices required in complex circuits, leading to compact electronics and large scale integration based on intrinsic 2-D semiconducting materials.

  15. Realization of Negative Capacitance with Topological Insulator Based MOS Capacitor

    NASA Astrophysics Data System (ADS)

    Yuan, Hui; Zhang, Kai; Zhu, Hao; Li, Haitao; Ioannou, Dimitris; Baumgart, Helmut; Richter, Curt; Li, Qiliang; ECE, George Mason University Team; Semiconductor and Dimensional Metrology Division of NIST Team; ECE, Old Dominion University Team

    2013-03-01

    Negative capacitance is one of way to achieve steep subthreshold slope exceeding its thermal limit in metal-oxide-semiconductor field effect transistor (MOSFET). The common materials under study for negative capacitance are ferroelectric thin films. However, the integration of regular ferroelectric materials (e.g., PZT) into semiconductor based devices is usually difficult due to the high temperature required for crystallization and precise control of oxygen percentage in ferroelectric materials. In this work, we found that negative capacitance can be achieved by introducing a topological insulator interlayer into a conventional MOS capacitor. Three-dimensional topological insulators inherently contain a insulator/semiconductor bulk and a gapless conducting surface. When an electric field is added to topological insulator interlayer, imbalanced charge carriers (electrons and holes) would be generated and then accumulate on either surface of the film, resulting in a temporary residual polarization. As a result, a ferroelectric-like hysteresis and negative capacitance are achieved. We believe this approach will be very attractive to achieve steep subthreshold using negative capacitance. Supported by NSF Career grant 0846649.

  16. Interpreting Transistor Noise

    NASA Astrophysics Data System (ADS)

    Pospieszalski, M. W.

    2010-10-01

    The simple noise models of field effect and bipolar transistors reviewed in this article are quite useful in engineering practice, as illustrated by measured and modeled results. The exact and approximate expressions for the noise parameters of FETs and bipolar transistors reveal certain common noise properties and some general noise properties of both devices. The usefulness of these expressions in interpreting the dependence of measured noise parameters on frequency, bias, and temperature and, consequently, in checking of consistency of measured data has been demonstrated.

  17. VOLTAGE-CONTROLLED TRANSISTOR OSCILLATOR

    DOEpatents

    Scheele, P.F.

    1958-09-16

    This patent relates to transistor oscillators and in particular to those transistor oscillators whose frequencies vary according to controlling voltages. A principal feature of the disclosed transistor oscillator circuit resides in the temperature compensation of the frequency modulating stage by the use of a resistorthermistor network. The resistor-thermistor network components are selected to have the network resistance, which is in series with the modulator transistor emitter circuit, vary with temperature to compensate for variation in the parameters of the transistor due to temperature change.

  18. An RF energy harvester system using UHF micropower CMOS rectifier based on a diode connected CMOS transistor.

    PubMed

    Shokrani, Mohammad Reza; Khoddam, Mojtaba; Hamidon, Mohd Nizar B; Kamsani, Noor Ain; Rokhani, Fakhrul Zaman; Shafie, Suhaidi Bin

    2014-01-01

    This paper presents a new type diode connected MOS transistor to improve CMOS conventional rectifier's performance in RF energy harvester systems for wireless sensor networks in which the circuits are designed in 0.18  μm TSMC CMOS technology. The proposed diode connected MOS transistor uses a new bulk connection which leads to reduction in the threshold voltage and leakage current; therefore, it contributes to increment of the rectifier's output voltage, output current, and efficiency when it is well important in the conventional CMOS rectifiers. The design technique for the rectifiers is explained and a matching network has been proposed to increase the sensitivity of the proposed rectifier. Five-stage rectifier with a matching network is proposed based on the optimization. The simulation results shows 18.2% improvement in the efficiency of the rectifier circuit and increase in sensitivity of RF energy harvester circuit. All circuits are designed in 0.18 μm TSMC CMOS technology.

  19. Accelerating the life of transistors

    NASA Astrophysics Data System (ADS)

    Haochun, Qi; Changzhi, Lü; Xiaoling, Zhang; Xuesong, Xie

    2013-06-01

    Choosing small and medium power switching transistors of the NPN type in a 3DK set as the study object, the test of accelerating life is conducted in constant temperature and humidity, and then the data are statistically analyzed with software developed by ourselves. According to degradations of such sensitive parameters as the reverse leakage current of transistors, the lifetime order of transistors is about more than 104 at 100 °C and 100% relative humidity (RH) conditions. By corrosion fracture of transistor outer leads and other failure modes, with the failure truncated testing, the average lifetime rank of transistors in different distributions is extrapolated about 103. Failure mechanism analyses of degradation of electrical parameters, outer lead fracture and other reasons that affect transistor lifetime are conducted. The findings show that the impact of external stress of outer leads on transistor reliability is more serious than that of parameter degradation.

  20. Radiation-hardened transistor and integrated circuit

    DOEpatents

    Ma, Kwok K.

    2007-11-20

    A composite transistor is disclosed for use in radiation hardening a CMOS IC formed on an SOI or bulk semiconductor substrate. The composite transistor has a circuit transistor and a blocking transistor connected in series with a common gate connection. A body terminal of the blocking transistor is connected only to a source terminal thereof, and to no other connection point. The blocking transistor acts to prevent a single-event transient (SET) occurring in the circuit transistor from being coupled outside the composite transistor. Similarly, when a SET occurs in the blocking transistor, the circuit transistor prevents the SET from being coupled outside the composite transistor. N-type and P-type composite transistors can be used for each and every transistor in the CMOS IC to radiation harden the IC, and can be used to form inverters and transmission gates which are the building blocks of CMOS ICs.

  1. Wafer-scale production of highly uniform two-dimensional MoS2 by metal-organic chemical vapor deposition.

    PubMed

    Kim, TaeWan; Mun, Jihun; Park, Hyeji; Joung, DaeHwa; Diware, Mangesh; Won, Chegal; Park, Jonghoo; Jeong, Soo-Hwan; Kang, Sang-Woo

    2017-05-05

    Semiconducting two-dimensional (2D) materials, particularly extremely thin molybdenum disulfide (MoS2) films, are attracting considerable attention from academia and industry owing to their distinctive optical and electrical properties. Here, we present the direct growth of a MoS2 monolayer with unprecedented spatial and structural uniformity across an entire 8 inch SiO2/Si wafer. The influences of growth pressure, ambient gases (Ar, H2), and S/Mo molar flow ratio on the MoS2 layered growth were explored by considering the domain size, nucleation sites, morphology, and impurity incorporation. Monolayer MoS2-based field effect transistors achieve an electron mobility of 0.47 cm(2) V(-1) s(-1) and on/off current ratio of 5.4 × 10(4). This work demonstrates the potential for reliable wafer-scale production of 2D MoS2 for practical applications in next-generation electronic and optical devices.

  2. MoS₂ P-type transistors and diodes enabled by high work function MoOx contacts.

    PubMed

    Chuang, Steven; Battaglia, Corsin; Azcatl, Angelica; McDonnell, Stephen; Kang, Jeong Seuk; Yin, Xingtian; Tosun, Mahmut; Kapadia, Rehan; Fang, Hui; Wallace, Robert M; Javey, Ali

    2014-03-12

    The development of low-resistance source/drain contacts to transition-metal dichalcogenides (TMDCs) is crucial for the realization of high-performance logic components. In particular, efficient hole contacts are required for the fabrication of p-type transistors with MoS2, a model TMDC. Previous studies have shown that the Fermi level of elemental metals is pinned close to the conduction band of MoS2, thus resulting in large Schottky barrier heights for holes with limited hole injection from the contacts. Here, we show that substoichiometric molybdenum trioxide (MoOx, x < 3), a high work function material, acts as an efficient hole injection layer to MoS2 and WSe2. In particular, we demonstrate MoS2 p-type field-effect transistors and diodes by using MoOx contacts. We also show drastic on-current improvement for p-type WSe2 FETs with MoOx contacts over devices made with Pd contacts, which is the prototypical metal used for hole injection. The work presents an important advance in contact engineering of TMDCs and will enable future exploration of their performance limits and intrinsic transport properties.

  3. Environmental Effects on Hysteresis of Transfer Characteristics in Molybdenum Disulfide Field-Effect Transistors

    NASA Astrophysics Data System (ADS)

    Shimazu, Yoshihiro; Tashiro, Mitsuki; Sonobe, Satoshi; Takahashi, Masaki

    2016-07-01

    Molybdenum disulfide (MoS2) has recently received much attention for nanoscale electronic and photonic applications. To explore the intrinsic properties and enhance the performance of MoS2-based field-effect transistors, thorough understanding of extrinsic effects such as environmental gas and contact resistance of the electrodes is required. Here, we report the effects of environmental gases on the transport properties of back-gated multilayered MoS2 field-effect transistors. Comparisons between different gases (oxygen, nitrogen, and air and nitrogen with varying relative humidities) revealed that water molecules acting as charge-trapping centers are the main cause of hysteresis in the transfer characteristics. While the hysteresis persisted even after pumping out the environmental gas for longer than 10 h at room temperature, it disappeared when the device was cooled to 240 K, suggesting a considerable increase in the time constant of the charge trapping/detrapping at these modestly low temperatures. The suppression of the hysteresis or instability in the easily attainable temperature range without surface passivation is highly advantageous for the device application of this system. The humidity dependence of the threshold voltages in the transfer curves indicates that the water molecules dominantly act as hole-trapping centers. A strong dependence of the on-state current on oxygen pressure was also observed.

  4. Centimeter-Scale CVD Growth of Highly Crystalline Single-Layer MoS2 Film with Spatial Homogeneity and the Visualization of Grain Boundaries.

    PubMed

    Tao, Li; Chen, Kun; Chen, Zefeng; Chen, Wenjun; Gui, Xuchun; Chen, Huanjun; Li, Xinming; Xu, Jian-Bin

    2017-04-05

    MoS2 monolayer attracts considerable attention due to its semiconducting nature with a direct bandgap which can be tuned by various approaches. Yet a controllable and low-cost method to produce large-scale, high-quality, and uniform MoS2 monolayer continuous film, which is of crucial importance for practical applications and optical measurements, remains a great challenge. Most previously reported MoS2 monolayer films had limited crystalline sizes, and the high density of grain boundaries inside the films greatly affected the electrical properties. Herein, we demonstrate that highly crystalline MoS2 monolayer film with spatial size up to centimeters can be obtained via a facile chemical vapor deposition method with solid-phase precursors. This growth strategy contains selected precursor and controlled diffusion rate, giving rise to the high quality of the film. The well-defined grain boundaries inside the continuous film, which are invisible under an optical microscope, can be clearly detected in photoluminescence mapping and atomic force microscope phase images, with a low density of ∼0.04 μm(-1). Transmission electron microscopy combined with selected area electron diffraction measurements further confirm the high structural homogeneity of the MoS2 monolayer film with large crystalline sizes. Electrical measurements show uniform and promising performance of the transistors made from the MoS2 monolayer film. The carrier mobility remains high at large channel lengths. This work opens a new pathway toward electronic and optical applications, and fundamental growth mechanism as well, of the MoS2 monolayer.

  5. Transistor voltage comparator performs own sensing

    NASA Technical Reports Server (NTRS)

    Cliff, R. A.

    1965-01-01

    Detection of the highest voltage input among a group of varying voltage inputs is accomplished by a transistorized voltage comparison circuit. The collector circuits of the transistors perform the sensing function. Input voltage levels are governed by the transistors.

  6. Improved chopper circuit uses parallel transistors

    NASA Technical Reports Server (NTRS)

    1966-01-01

    Parallel transistor chopper circuit operates with one transistor in the forward mode and the other in the inverse mode. By using this method, it acts as a single, symmetrical, bidirectional transistor, and reduces and stabilizes the offset voltage.

  7. High-Current Gain Two-Dimensional MoS₂-Base Hot-Electron Transistors.

    PubMed

    Torres, Carlos M; Lan, Yann-Wen; Zeng, Caifu; Chen, Jyun-Hong; Kou, Xufeng; Navabi, Aryan; Tang, Jianshi; Montazeri, Mohammad; Adleman, James R; Lerner, Mitchell B; Zhong, Yuan-Liang; Li, Lain-Jong; Chen, Chii-Dong; Wang, Kang L

    2015-12-09

    The vertical transport of nonequilibrium charge carriers through semiconductor heterostructures has led to milestones in electronics with the development of the hot-electron transistor. Recently, significant advances have been made with atomically sharp heterostructures implementing various two-dimensional materials. Although graphene-base hot-electron transistors show great promise for electronic switching at high frequencies, they are limited by their low current gain. Here we show that, by choosing MoS2 and HfO2 for the filter barrier interface and using a noncrystalline semiconductor such as ITO for the collector, we can achieve an unprecedentedly high-current gain (α ∼ 0.95) in our hot-electron transistors operating at room temperature. Furthermore, the current gain can be tuned over 2 orders of magnitude with the collector-base voltage albeit this feature currently presents a drawback in the transistor performance metrics such as poor output resistance and poor intrinsic voltage gain. We anticipate our transistors will pave the way toward the realization of novel flexible 2D material-based high-density, low-energy, and high-frequency hot-carrier electronic applications.

  8. Measurement and Analysis of a Ferroelectric Field-Effect Transistor NAND Gate

    NASA Technical Reports Server (NTRS)

    Phillips, Thomas A.; MacLeond, Todd C.; Sayyah, Rana; Ho, Fat Duen

    2009-01-01

    Previous research investigated expanding the use of Ferroelectric Field-Effect Transistors (FFET) to other electronic devices beyond memory circuits. Ferroelectric based transistors possess unique characteris tics that give them interesting and useful properties in digital logic circuits. The NAND gate was chosen for investigation as it is one of the fundamental building blocks of digital electronic circuits. In t his paper, NAND gate circuits were constructed utilizing individual F FETs. N-channel FFETs with positive polarization were used for the standard CMOS NAND gate n-channel transistors and n-channel FFETs with n egative polarization were used for the standard CMOS NAND gate p-chan nel transistors. The voltage transfer curves were obtained for the NA ND gate. Comparisons were made between the actual device data and the previous modeled data. These results are compared to standard MOS logic circuits. The circuits analyzed are not intended to be fully opera tional circuits that would interface with existing logic circuits, bu t as a research tool to look into the possibility of using ferroelectric transistors in future logic circuits. Possible applications for th ese devices are presented, and their potential benefits and drawbacks are discussed.

  9. Hybrid Flexible Resistive Random Access Memory-Gated Transistor for Novel Nonvolatile Data Storage.

    PubMed

    Han, Su-Ting; Zhou, Ye; Chen, Bo; Wang, Chundong; Zhou, Li; Yan, Yan; Zhuang, Jiaqing; Sun, Qijun; Zhang, Hua; Roy, V A L

    2016-01-20

    Here, a single-device demonstration of novel hybrid architecture is reported to achieve programmable transistor nodes which have analogies to flash memory by incorporating a resistive switching random access memory (RRAM) device as a resistive switch gate for field effect transistor (FET) on a flexible substrate. A high performance flexible RRAM with a three-layered structure is fabricated by utilizing solution-processed MoS2 nanosheets sandwiched between poly(methyl methacrylate) polymer layers. Gate coupling with the pentacene-based transistor can be controlled by the RRAM memory state to produce a nonprogrammed state (inactive) and a programmed state (active) with a well-defined memory window. Compared to the reference flash memory device based on the MoS2 floating gate, the hybrid device presents robust access speed and retention ability. Furthermore, the hybrid RRAM-gated FET is used to build an integrated logic circuit and a wide logic window in inverter logic is achieved. The controllable, well-defined memory window, long retention time, and fast access speed of this novel hybrid device may open up new possibilities of realizing fully functional nonvolatile memory for high-performance flexible electronics.

  10. High voltage power transistor development

    NASA Technical Reports Server (NTRS)

    Hower, P. L.

    1981-01-01

    Design considerations, fabrication procedures, and methods of evaluation for high-voltage power-transistor development are discussed. Technique improvements such as controlling the electric field at the surface and perserving lifetimes in the collector region which have advanced the state of the art in high-voltage transistors are discussed. These improvements can be applied directly to the development of 1200 volt, 200 ampere transistors.

  11. TRANSISTOR HIGH VOLTAGE POWER SUPPLY

    DOEpatents

    Driver, G.E.

    1958-07-15

    High voltage, direct current power supplies are described for use with battery powered nuclear detection equipment. The particular advantages of the power supply described, are increased efficiency and reduced size and welght brought about by the use of transistors in the circuit. An important feature resides tn the employment of a pair of transistors in an alternatefiring oscillator circuit having a coupling transformer and other circuit components which are used for interconnecting the various electrodes of the transistors.

  12. Ion bipolar junction transistors

    PubMed Central

    Tybrandt, Klas; Larsson, Karin C.; Richter-Dahlfors, Agneta; Berggren, Magnus

    2010-01-01

    Dynamic control of chemical microenvironments is essential for continued development in numerous fields of life sciences. Such control could be achieved with active chemical circuits for delivery of ions and biomolecules. As the basis for such circuitry, we report a solid-state ion bipolar junction transistor (IBJT) based on conducting polymers and thin films of anion- and cation-selective membranes. The IBJT is the ionic analogue to the conventional semiconductor BJT and is manufactured using standard microfabrication techniques. Transistor characteristics along with a model describing the principle of operation, in which an anionic base current amplifies a cationic collector current, are presented. By employing the IBJT as a bioelectronic circuit element for delivery of the neurotransmitter acetylcholine, its efficacy in modulating neuronal cell signaling is demonstrated. PMID:20479274

  13. Ion bipolar junction transistors.

    PubMed

    Tybrandt, Klas; Larsson, Karin C; Richter-Dahlfors, Agneta; Berggren, Magnus

    2010-06-01

    Dynamic control of chemical microenvironments is essential for continued development in numerous fields of life sciences. Such control could be achieved with active chemical circuits for delivery of ions and biomolecules. As the basis for such circuitry, we report a solid-state ion bipolar junction transistor (IBJT) based on conducting polymers and thin films of anion- and cation-selective membranes. The IBJT is the ionic analogue to the conventional semiconductor BJT and is manufactured using standard microfabrication techniques. Transistor characteristics along with a model describing the principle of operation, in which an anionic base current amplifies a cationic collector current, are presented. By employing the IBJT as a bioelectronic circuit element for delivery of the neurotransmitter acetylcholine, its efficacy in modulating neuronal cell signaling is demonstrated.

  14. Junctionless Cooper pair transistor

    NASA Astrophysics Data System (ADS)

    Arutyunov, K. Yu.; Lehtinen, J. S.

    2017-02-01

    Quantum phase slip (QPS) is the topological singularity of the complex order parameter of a quasi-one-dimensional superconductor: momentary zeroing of the modulus and simultaneous 'slip' of the phase by ±2π. The QPS event(s) are the dynamic equivalent of tunneling through a conventional Josephson junction containing static in space and time weak link(s). Here we demonstrate the operation of a superconducting single electron transistor (Cooper pair transistor) without any tunnel junctions. Instead a pair of thin superconducting titanium wires in QPS regime was used. The current-voltage characteristics demonstrate the clear Coulomb blockade with magnitude of the Coulomb gap modulated by the gate potential. The Coulomb blockade disappears above the critical temperature, and at low temperatures can be suppressed by strong magnetic field.

  15. Polarization induced doped transistor

    SciTech Connect

    Xing, Huili; Jena, Debdeep; Nomoto, Kazuki; Song, Bo; Zhu, Mingda; Hu, Zongyang

    2016-06-07

    A nitride-based field effect transistor (FET) comprises a compositionally graded and polarization induced doped p-layer underlying at least one gate contact and a compositionally graded and doped n-channel underlying a source contact. The n-channel is converted from the p-layer to the n-channel by ion implantation, a buffer underlies the doped p-layer and the n-channel, and a drain underlies the buffer.

  16. Hydrogen intercalation in MoS2

    NASA Astrophysics Data System (ADS)

    Zhu, Zhen; Peelaers, Hartwin; Van de Walle, Chris G.

    2016-08-01

    We investigate the structure and energetics of interstitial hydrogen and hydrogen molecules in layered 2 H -MoS2, an issue of interest both for hydrogen storage applications and for the use of MoS2 as an (opto)electronic material. Using first-principles density functional theory we find that hydrogen interstitials are deep donors. H2 molecules are electrically inactive and energetically more stable than hydrogen interstitials. Their equilibrium position is the hollow site of the MoS2 layers. The migration barrier of a hydrogen molecule is calculated to be smaller than 0.6 eV. We have also explored the insertion energies of hydrogen molecules as a function of hydrogen concentration in MoS2. For low concentrations, additional inserted H2 molecules prefer to be located in hollow sites (on top of the center of a hexagon) in the vicinity of an occupied site. Once two molecules have been inserted, the energy cost for inserting additional H2 molecules becomes much lower. Once all hollow sites are filled, the energy cost increases, but only by a modest amount. We find that up to 13 H2 molecules can be accommodated within the same interlayer spacing of an areal 3 ×3 supercell.

  17. Valleytronics. The valley Hall effect in MoS₂ transistors.

    PubMed

    Mak, K F; McGill, K L; Park, J; McEuen, P L

    2014-06-27

    Electrons in two-dimensional crystals with a honeycomb lattice structure possess a valley degree of freedom (DOF) in addition to charge and spin. These systems are predicted to exhibit an anomalous Hall effect whose sign depends on the valley index. Here, we report the observation of this so-called valley Hall effect (VHE). Monolayer MoS2 transistors are illuminated with circularly polarized light, which preferentially excites electrons into a specific valley, causing a finite anomalous Hall voltage whose sign is controlled by the helicity of the light. No anomalous Hall effect is observed in bilayer devices, which have crystal inversion symmetry. Our observation of the VHE opens up new possibilities for using the valley DOF as an information carrier in next-generation electronics and optoelectronics.

  18. SEMICONDUCTOR INTEGRATED CIRCUITS: An enhanced close-in phase noise LC-VCO using parasitic V-NPN transistors in a CMOS process

    NASA Astrophysics Data System (ADS)

    Peijun, Gao; J, Oh N.; Hao, Min

    2009-08-01

    A differential LC voltage controlled oscillator (VCO) employing parasitic vertical-NPN (V-NPN) transistors as a negative gm-cell is presented to improve the close-in phase noise. The V-NPN transistors have lower flicker noise compared to MOS transistors. DC and AC characteristics of the V-NPN transistors are measured to facilitate the VCO design. The proposed VCO is implemented in a 0.18 μm CMOS RF/mixed signal process, and the measurement results show the close-in phase noise is improved by 3.5-9.1 dB from 100 Hz to 10 kHz offset compared to that of a similar CMOS VCO. The proposed VCO consumes only 0.41 mA from a 1.5 V power supply.

  19. Stable charge storing in two-dimensional MoS2 nanoflake floating gates for multilevel organic flash memory

    NASA Astrophysics Data System (ADS)

    Kang, Minji; Kim, Yeong-A.; Yun, Jin-Mun; Khim, Dongyoon; Kim, Jihong; Noh, Yong-Young; Baeg, Kang-Jun; Kim, Dong-Yu

    2014-10-01

    In this study, we investigated chemically exfoliated two-dimensional (2-D) nanoflakes of molybdenum disulfide (MoS2) as charge-storing elements for use in organic multilevel memory devices (of the printed/flexible non-volatile type) based on organic field-effect transistors (OFETs) containing poly(3-hexylthiophene) (P3HT). The metallic MoS2 nanoflakes were exfoliated in 2-methoxyethanol by the lithium intercalation method and were deposited as nano-floating gates between polystyrene and poly(methyl methacrylate), used as bilayered gate dielectrics, by a simple spin-coating and low temperature (<150 °C) process. In the developed OFET memory devices, electrons could be trapped/detrapped in the MoS2 nano-floating gates by modulating the charge carrier density in the active channel through gate bias control. Optimal memory characteristics were achieved by controlling the thickness and concentration of few-layered MoS2 nanoflakes, and the best device showed reliable non-volatile memory properties: a sufficient memory window of ~23 V, programming-reading-erasing cycling endurance of >102 times, and most importantly, quasi-permanent charge-storing characteristics, i.e., a very long retention time (longer than the technological requirement of commercial memory devices (>10 years)). In addition, we successfully developed multilevel memory cells (2 bits per cell) by controlling the gate bias magnitude.In this study, we investigated chemically exfoliated two-dimensional (2-D) nanoflakes of molybdenum disulfide (MoS2) as charge-storing elements for use in organic multilevel memory devices (of the printed/flexible non-volatile type) based on organic field-effect transistors (OFETs) containing poly(3-hexylthiophene) (P3HT). The metallic MoS2 nanoflakes were exfoliated in 2-methoxyethanol by the lithium intercalation method and were deposited as nano-floating gates between polystyrene and poly(methyl methacrylate), used as bilayered gate dielectrics, by a simple spin-coating and

  20. Graphene - ferroelectric and MoS2 - ferroelectric heterostructures for memory applications

    NASA Astrophysics Data System (ADS)

    Lipatov, Alexey; Sharma, Pankaj; Gruverman, Alexei; Sinitskii, Alexander

    In recent years there has been an unprecedented interest in two-dimensional (2D) materials with unique physical and chemical properties that cannot be found in their three-dimensional (3D) counterparts. One of the important advantages of 2D materials is that they can be easily integrated with other 2D materials and functional films, resulting in multilayered structures with new properties. We fabricated and tested electronic and memory properties of field-effect transistors (FETs) based on a single-layer graphene combined with lead zirconium titanate (PZT) substrate. Previously studied graphene-PZT devices exhibited an unusual electronic behavior such as clockwise hysteresis of electronic transport, in contradiction with counterclockwise polarization dependence of PZT. We investigated how the interplay of polarization and interfacial phenomena affects the electronic behavior and memory characteristics of graphene-PZT FETs, explain the origin of unusual clockwise hysteresis and experimentally demonstrate a reversed polarization-dependent hysteresis of electronic transport. In addition we fabricated and tested properties of MoS2-PZT FETs which exhibit a large hysteresis of electronic transport with high ON/OFF ratios. We demonstrate that MoS2-PZT memories have a number of advantages over commercial FeRAMs, such as nondestructive data readout, low operation voltage, wide memory window and the possibility to write and erase them both electrically and optically.

  1. Organic thin-film transistors.

    PubMed

    Klauk, Hagen

    2010-07-01

    Over the past 20 years, organic transistors have developed from a laboratory curiosity to a commercially viable technology. This critical review provides a short summary of several important aspects of organic transistors, including materials, microstructure, carrier transport, manufacturing, electrical properties, and performance limitations (200 references).

  2. Flexible integrated circuits and multifunctional electronics based on single atomic layers of MoS2 and graphene

    NASA Astrophysics Data System (ADS)

    Amani, Matin; Burke, Robert A.; Proie, Robert M.; Dubey, Madan

    2015-03-01

    Two-dimensional materials, such as graphene and its analogues, have been investigated by numerous researchers for high performance flexible and conformal electronic systems, because they offer the ultimate level of thickness scaling, atomically smooth surfaces and high crystalline quality. Here, we use layer-by-layer transfer of large area molybdenum disulphide (MoS2) and graphene grown by chemical vapor deposition (CVD) to demonstrate electronics on flexible polyimide (PI) substrates. On the same PI substrate, we are able to simultaneously fabricate MoS2 based logic, non-volatile memory cells with graphene floating gates, photo-detectors and MoS2 transistors with tunable source and drain contacts. We are also able to demonstrate that these flexible heterostructure devices have very high electronic performance, comparable to four point measurements taken on SiO2 substrates, with on/off ratios >107 and field effect mobilities as high as 16.4 cm2 V-1 s-1. Additionally, the heterojunctions show high optoelectronic sensitivity and were operated as photodetectors with responsivities over 30 A W-1. Through local gating of the individual graphene/MoS2 contacts, we are able to tune the contact resistance over the range of 322-1210 Ω mm for each contact, by modulating the graphene work function. This leads to devices with tunable and multifunctional performance that can be implemented in a conformable platform.

  3. Transparent metal oxide nanowire transistors

    NASA Astrophysics Data System (ADS)

    Chen, Di; Liu, Zhe; Liang, Bo; Wang, Xianfu; Shen, Guozhen

    2012-05-01

    With the features of high mobility, a high electric on/off ratio and excellent transparency, metal oxide nanowires are excellent candidates for transparent thin-film transistors, which is one of the key technologies to realize transparent electronics. This article provides a comprehensive review of the state-of-the-art research activities that focus on transparent metal oxide nanowire transistors. It begins with the brief introduction to the synthetic methods for high quality metal oxide nanowires, and the typical nanowire transfer and printing techniques with emphasis on the simple contact printing methodology. High performance transparent transistors built on both single nanowires and nanowire thin films are then highlighted. The final section deals with the applications of transparent metal oxide nanowire transistors in the field of transparent displays and concludes with an outlook on the current perspectives and future directions of transparent metal oxide nanowire transistors.

  4. Transparent metal oxide nanowire transistors.

    PubMed

    Chen, Di; Liu, Zhe; Liang, Bo; Wang, Xianfu; Shen, Guozhen

    2012-05-21

    With the features of high mobility, a high electric on/off ratio and excellent transparency, metal oxide nanowires are excellent candidates for transparent thin-film transistors, which is one of the key technologies to realize transparent electronics. This article provides a comprehensive review of the state-of-the-art research activities that focus on transparent metal oxide nanowire transistors. It begins with the brief introduction to the synthetic methods for high quality metal oxide nanowires, and the typical nanowire transfer and printing techniques with emphasis on the simple contact printing methodology. High performance transparent transistors built on both single nanowires and nanowire thin films are then highlighted. The final section deals with the applications of transparent metal oxide nanowire transistors in the field of transparent displays and concludes with an outlook on the current perspectives and future directions of transparent metal oxide nanowire transistors.

  5. The coupled atom transistor

    NASA Astrophysics Data System (ADS)

    Jehl, X.; Voisin, B.; Roche, B.; Dupont-Ferrier, E.; De Franceschi, S.; Sanquer, M.; Cobian, M.; Niquet, Y.-M.; Sklénard, B.; Cueto, O.; Wacquez, R.; Vinet, M.

    2015-04-01

    We describe the first implementation of a coupled atom transistor where two shallow donors (P or As) are implanted in a nanoscale silicon nanowire and their electronic levels are controlled with three gate voltages. Transport spectroscopy through these donors placed in series is performed both at zero and microwave frequencies. The coherence of the charge transfer between the two donors is probed by Landau-Zener-Stückelberg interferometry. Single-charge transfer at zero bias (electron pumping) has been performed and the crossover between the adiabatic and non-adiabatic regimes is studied.

  6. Power transistor switching characterization

    NASA Technical Reports Server (NTRS)

    Blackburn, D. L.

    1981-01-01

    The switching properties of power transistors are investigated. The devices studied were housed in IO-3 cases and were of an n(+)-p-n(-)-n(+) vertical dopant structure. The effects of the magnitude of the reverse-base current and temperature on the reverse-bias second breakdown characteristics are discussed. Brief discussions of device degradation due to second breakdown and of a constant voltage turn-off circuit are included. A description of a vacuum tube voltage clamp circuit which reduces clamped collector voltage overshoot is given.

  7. REGENERATIVE TRANSISTOR AMPLIFIER

    DOEpatents

    Kabell, L.J.

    1958-11-25

    Electrical circults for use in computers and the like are described. particularly a regenerative bistable transistor amplifler which is iurned on by a clock signal when an information signal permits and is turned off by the clock signal. The amplifier porforms the above function with reduced power requirements for the clock signal and circuit operation. The power requirements are reduced in one way by employing transformer coupling which increases the collector circuit efficiency by eliminating the loss of power in the collector load resistor.

  8. Integrated P-channel MOS gyrator

    NASA Technical Reports Server (NTRS)

    Hochmair, E. S. (Inventor)

    1974-01-01

    A gyrator circuit is described which is of the conventional configuration of two amplifiers in a circular loop, one producing zero phase shift and the other producing 180 phase reversal, in a circuit having medium Q composed of all field effect transistors of the same conductivity type. The current source to each gyrator amplifier comprises an amplifier which responds to changes in current, with the amplified signals feed back so as to limit current. The feedback amplifier has a large capacitor connected to bypass high frequency components, thereby stabilizing the output. The design makes possible fabrication of circuits with transistors of only one conductivity type, providing economies in manufacture and use.

  9. Electrical and photo-electrical properties of MoS2 nanosheets with and without an Al2O3 capping layer under various environmental conditions

    PubMed Central

    Khan, Muhammad Farooq; Nazir, Ghazanfar; lermolenko, Volodymyr M.; Eom, Jonghwa

    2016-01-01

    Abstract The electrical and photo-electrical properties of exfoliated MoS2 were investigated in the dark and in the presence of deep ultraviolet (DUV) light under various environmental conditions (vacuum, N2 gas, air, and O2 gas). We examined the effects of environmental gases on MoS2 flakes in the dark and after DUV illumination through Raman spectroscopy and found that DUV light induced red and blue shifts of peaks (E1 2 g and A1 g) position in the presence of N2 and O2 gases, respectively. In the dark, the threshold voltage in the transfer characteristics of few-layer (FL) MoS2 field-effect transistors (FETs) remained almost the same in vacuum and N2 gas but shifted toward positive gate voltages in air or O2 gas because of the adsorption of oxygen atoms/molecules on the MoS2 surface. We analyzed light detection parameters such as responsivity, detectivity, external quantum efficiency, linear dynamic range, and relaxation time to characterize the photoresponse behavior of FL-MoS2 FETs under various environmental conditions. All parameters were improved in their performances in N2 gas, but deteriorated in O2 gas environment. The photocurrent decayed with a large time constant in N2 gas, but decayed with a small time constant in O2 gas. We also investigated the characteristics of the devices after passivating by Al2O3 film on the MoS2 surface. The devices became almost hysteresis-free in the transfer characteristics and stable with improved mobility. Given its outstanding performance under DUV light, the passivated device may be potentially used for applications in MoS2-based integrated optoelectronic circuits, light sensing devices, and solar cells. PMID:27877867

  10. 1/f noise in thin oxide p-channel metal-nitride-oxide-silicon transistors

    NASA Astrophysics Data System (ADS)

    Maes, Herman E.; Usmani, Sabir H.

    1983-04-01

    The 1/f noise behavior of p-channel metal-nitride-oxide-silicon transistors is presented. Devices with different oxide thicknesses, geometries and different technological treatments were used for this study. It is shown that the noise behavior can be well explained quantitatively with the number fluctuation model developed for MOS transistors. The close correlation between the increase of the noise and of the interface state density after different levels of degradation indeed indicates that the exchange of carriers between the channel and the interface traps lies at the origin of the 1/f noise. The observed degradation in MNOS devices is consistent with a diffusion controlled model for the creation of surface traps but is found to be a saturating effect. The predictions of the mobility fluctuation model are not confirmed in our experiments.

  11. Compensating For Changes in MOS Sensors

    SciTech Connect

    Matzke, Brett D.

    2006-09-29

    AirAdvice provided the following introduction: “AirAdvice uses metal oxide semiconductor (MOS) sensors for measuring total volatile organic compounds (TVOC) in air. These sensors are incorporated into AirAdvice’s indoor air quality (IAQ) monitors. The IAQ monitors are designed so that they require annual calibration to maintain acceptable accuracy. Since the MOS TVOC sensors used in the monitors change in sensitivity with time and exposure to gases, AirAdvice has developed an algorithm-based process that automatically compensates for changes in the sensors. The proposed project is to have PNNL analyze data provided by AirAdvice with these objectives: (1) assess how effective AirAdvice’s automatic drift correction process is, (2) identify any problems in the process, and (3) propose improvements to the process.”

  12. Highly stretchable MoS2 kirigami.

    PubMed

    Hanakata, Paul Z; Qi, Zenan; Campbell, David K; Park, Harold S

    2016-01-07

    We report the results of classical molecular dynamics simulations focused on studying the mechanical properties of MoS2 kirigami. Several different kirigami structures were studied based upon two simple non-dimensional parameters, which are related to the density of cuts, as well as the ratio of the overlapping cut length to the nanoribbon length. Our key findings are significant enhancements in tensile yield (by a factor of four) and fracture strains (by a factor of six) as compared to pristine MoS2 nanoribbons. These results, in conjunction with recent results on graphene, suggest that the kirigami approach may be generally useful for enhancing the ductility of two-dimensional nanomaterials.

  13. Highly stretchable MoS2 kirigami

    NASA Astrophysics Data System (ADS)

    Hanakata, Paul Z.; Qi, Zenan; Campbell, David K.; Park, Harold S.

    2015-12-01

    We report the results of classical molecular dynamics simulations focused on studying the mechanical properties of MoS2 kirigami. Several different kirigami structures were studied based upon two simple non-dimensional parameters, which are related to the density of cuts, as well as the ratio of the overlapping cut length to the nanoribbon length. Our key findings are significant enhancements in tensile yield (by a factor of four) and fracture strains (by a factor of six) as compared to pristine MoS2 nanoribbons. These results, in conjunction with recent results on graphene, suggest that the kirigami approach may be generally useful for enhancing the ductility of two-dimensional nanomaterials.

  14. Critical Secondary Military Occupational Specialty (MOS) Study

    DTIC Science & Technology

    2002-12-20

    training/education options where a graduate degree is not required. (f) Assign SEP billet functions to GS civilians or contracted specialists where...education options where a graduate degree is not required • Assign SEP billet functions to GS civilians or contracted specialists where no requirement for...previously held PMOS 2502 or PMOS 4002 have been reclassified with PMOS 0602, Command and Control Systems Officer. • MOS 9973 . This is a temporary skill

  15. RF Plasma Annealing on MOS Structures.

    DTIC Science & Technology

    1981-12-01

    with =012 -1I LE = 0.03 eV and va - 1 sec , the calculated EM is 1.1 eV. As reported by many previous workers ( Fanet and Poirier 1974, DiMaria 1978...Butler, "Charge Trapping and Associated Luminescence in MOS Oxide Layers." Leigh University (1980). J. M. Fanet and R. Poirier, "Charge Storage in 5i02

  16. A Matterwave Transistor Oscillator

    NASA Astrophysics Data System (ADS)

    Caliga, Seth; Straatsma, Cameron; Anderson, Dana

    2013-05-01

    We perform experiments with an Rb87 Bose-condensed gas in a magnetic trap separated into three regions by a pair of blue-detuned optical barriers, forming a transistor-like structure having large ``source'' and ``drain'' regions separated by a narrow ``gate'' region. A condensate is produced in the source by forced RF evaporative cooling. While atom number and chemical potential of the source atoms are determined by traditional time of flight methods, we observe the flux and energy of the drain atoms emerging from the gate-drain barrier with a high resolution (NA = 0.6) in-trap absorption imaging system. Asymmetric cooling of the trap causes a thermo-mechanically induced superfluid current to flow from the source to the gate over the source-gate barrier. Feedback through superfluid coupling between the source and the gate maintains near equality of the source and gate chemical potentials while superfluid flow continues to cause atoms to emerge from the gate into the drain. A resonant ``terminator'' beam illuminating the drain region effectively couples emerging gate atoms to the vacuum. By turning off the terminator beam shortly before snapping an absorption image we determine both the atom flux and the atom energy. With an appropriate choice of cooling schedule, barrier heights, and separations, the gate emits a monoenergetic beam of atoms. We establish that this system is a superfluid analog of an antenna-coupled transistor-oscillator circuit in which the dual of the electromagnetic wave is a matterwave.

  17. Copper atomic-scale transistors

    PubMed Central

    Kavalenka, Maryna N; Röger, Moritz; Albrecht, Daniel; Hölscher, Hendrik; Leuthold, Jürgen

    2017-01-01

    We investigated copper as a working material for metallic atomic-scale transistors and confirmed that copper atomic-scale transistors can be fabricated and operated electrochemically in a copper electrolyte (CuSO4 + H2SO4) in bi-distilled water under ambient conditions with three microelectrodes (source, drain and gate). The electrochemical switching-on potential of the atomic-scale transistor is below 350 mV, and the switching-off potential is between 0 and −170 mV. The switching-on current is above 1 μA, which is compatible with semiconductor transistor devices. Both sign and amplitude of the voltage applied across the source and drain electrodes (U bias) influence the switching rate of the transistor and the copper deposition on the electrodes, and correspondingly shift the electrochemical operation potential. The copper atomic-scale transistors can be switched using a function generator without a computer-controlled feedback switching mechanism. The copper atomic-scale transistors, with only one or two atoms at the narrowest constriction, were realized to switch between 0 and 1G 0 (G 0 = 2e2/h; with e being the electron charge, and h being Planck’s constant) or 2G 0 by the function generator. The switching rate can reach up to 10 Hz. The copper atomic-scale transistor demonstrates volatile/non-volatile dual functionalities. Such an optimal merging of the logic with memory may open a perspective for processor-in-memory and logic-in-memory architectures, using copper as an alternative working material besides silver for fully metallic atomic-scale transistors. PMID:28382242

  18. Graphene as tunable contact for high performance thin film transistor

    NASA Astrophysics Data System (ADS)

    Liu, Yuan

    performance and mechanical robustness. By using the graphene as a work-function tunable contact for amorphous indium gallium zinc oxide (IGZO) thin film, the vertical current flow across the graphene-IGZO junction can be effectively modulated by an external gate potential to enable VTFTs with a highest on-off ratio exceeding 105. The unique vertical transistor architecture can readily enable ultrashort channel devices with very high delivering current and exceptional mechanical flexibility. Furthermore, I will, demonstrate a new design strategy for vertical OTFT with ultra-short channel length without using conventional high-resolution lithography process. They can deliver a high current density over 1.8 A/ cm2 and thus enable a high cutoff frequency devices (~ 0.4 MHz) comparable with the ultra-short channel organic transistors. Importantly, with unique vertical architecture, the entire organic channel material is sandwiched between the source and drain electrodes and is thus naturally protected to ensure excellent air-stability. Finally I will present a new strategy by using graphene as the back electrodes to achieve Ohmic contact to MoS2. With a finite density of states, the Fermi level of graphene can be readily tuned by a gate potential to enable a nearly perfect band alignment with MoS2. For the first time, a transparent contact to MoS2 is demonstrated with zero contact barrier and linear output behaviour at cryogenic temperatures (down to 1.9 K) for both monolayer and multilayer MoS2. Benefiting from the barrier-free transparent contacts, we show that a metal-insulator-transition (MIT) can be observed in a two-terminal MoS2 device, a phenomenon that could be easily masked by Schottky barriers found in conventional metal-contacted MoS2 devices. With further passivation by boron nitride (BN) encapsulation, we demonstrate a record-high extrinsic (two-terminal) field effect mobility up to 1300 cm2/V s in MoS2 at low temperature. These findings can open up exciting new

  19. Evaluation of a gate-first process for AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors with low ohmic annealing temperature

    NASA Astrophysics Data System (ADS)

    Liuan, Li; Jiaqi, Zhang; Yang, Liu; Jin-Ping, Ao

    2016-03-01

    In this paper, TiN/AlOx gated AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors (MOS-HFETs) were fabricated for gate-first process evaluation. By employing a low temperature ohmic process, ohmic contact can be obtained by annealing at 600 °C with the contact resistance approximately 1.6 Ω·mm. The ohmic annealing process also acts as a post-deposition annealing on the oxide film, resulting in good device performance. Those results demonstrated that the TiN/AlOx gated MOS-HFETs with low temperature ohmic process can be applied for self-aligned gate AlGaN/GaN MOS-HFETs. Project supported by the International Science and Technology Collaboration Program of China (Grant No. 2012DFG52260).

  20. Transposon-Assisted Genetic Engineering with Mos1-Mediated Single-Copy Insertion (MosSCI).

    PubMed

    Frøkjær-Jensen, Christian

    2015-01-01

    Transgenesis in model organisms is necessary to determine the function, expression, and subcellular localization of gene products. In Caenorhabditis elegans, injected DNA can be propagated as multicopy extrachromosomal arrays but transgenes in arrays are mosaic, over-expressed in some tissues and silenced in the germline. Here, a method to insert a transgene into a specific genomic location called Mos1-mediated single-copy insertion (MosSCI) is described. Single-copy insertion allows transgene expression at levels that approximate endogenous gene expression as well as expression in the germline.

  1. Interference-based molecular transistors

    PubMed Central

    Li, Ying; Mol, Jan A.; Benjamin, Simon C.; Briggs, G. Andrew D.

    2016-01-01

    Molecular transistors have the potential for switching with lower gate voltages than conventional field-effect transistors. We have calculated the performance of a single-molecule device in which there is interference between electron transport through the highest occupied molecular orbital and the lowest unoccupied molecular orbital of a single molecule. Quantum interference results in a subthreshold slope that is independent of temperature. For realistic parameters the change in gate potential required for a change in source-drain current of two decades is 20 mV, which is a factor of six smaller than the theoretical limit for a metal-oxide-semiconductor field-effect transistor. PMID:27646692

  2. Two-Dimensional MoS2 Transistors for Low- Power RF Applications

    DTIC Science & Technology

    2015-03-16

    atomic layer deposition . The most effective way of characterizing an ohmic metallization scheme is to extract its specific contact resistance...N5 has used atomic layer deposition (ALD) method to deposit two gate dielectrics: one Al2O3 (k =11) and SiO2 (k =3.9) as gate dielectrics. The...investigate the mechanism for such characteristics in future. Phase II Plans 1. Utilization of atomic layer deposition for large area deposition of

  3. A method for polycrystalline silicon delineation applicable to a double-diffused MOS transistor

    NASA Technical Reports Server (NTRS)

    Halsor, J. L.; Lin, H. C.

    1974-01-01

    Method is simple and eliminates requirement for unreliable special etchants. Structure is graded in resistivity to prevent punch-through and has very narrow channel length to increase frequency response. Contacts are on top to permit planar integrated circuit structure. Polycrystalline shield will prevent creation of inversion layer in isolated region.

  4. From DNA to transistors

    NASA Astrophysics Data System (ADS)

    Braun, Erez; Keren, Kinneret

    2004-06-01

    The rapid advance in molecular biology and nanotechnology opens up the possibility to explore the interface between biology and electronics at the single-molecule level. We focus on the organization of molecular electronic circuits. Interconnecting an immense number of molecular devices into a functional circuit and constructing a framework for integrated molecular electronics requires new concepts. A promising avenue relies on bottom-up assembly where the information for the circuit connectivity and functionality is embedded in the molecular building blocks. Biology can provide concepts and mechanisms for advancing this approach, but there is no straightforward way to apply them to electronics since biological molecules are essentially electrically insulating. Bridging the chasm between biology and electronics therefore presents great challenges. Circuit organization on the molecular scale is considered and contrasted with the levels of organization presented by the living world. The discussion then focuses on our proposal to harness DNA and molecular biology to construct the scaffold for integrated molecular electronics. DNA metallization is used to convert the DNA scaffold into a conductive one. We present the framework of sequence-specific molecular lithography based on the biological mechanism of homologous genetic recombination and carried out by the bacterial protein RecA. Molecular lithography enables us to use the information encoded in the scaffold DNA molecules for directing the construction of an electronic circuit. We show that it can lead all the way from DNA molecules to working transistors in a test-tube. Carbon nanotubes are incorporated as the active electronic components in the DNA-templated transistors. Our approach can, in principle, be applied to the fabrication of larger-scale electronic circuits. The realization of complex DNA-based circuits will, however, require new concepts and additional biological machinery allowing, for example

  5. Solder Bonding for Power Transistors

    NASA Technical Reports Server (NTRS)

    Snytsheuvel, H. A.; Mandel, H.

    1985-01-01

    Indium solder boosts power rating and facilitates circuit changes. Efficient heat conduction from power transistor to heat sink provided by layer of indium solder. Low melting point of indium solder (141 degrees C) allows power transistor to be removed, if circuit must be reworked, without disturbing other components mounted with ordinary solder that melts at 181 degrees C. Solder allows devices operated at higher power levels than does conventional attachment by screws.

  6. Evolvable circuit with transistor-level reconfigurability

    NASA Technical Reports Server (NTRS)

    Stoica, Adrian (Inventor); Salazar-Lazaro, Carlos Harold (Inventor)

    2004-01-01

    An evolvable circuit includes a plurality of reconfigurable switches, a plurality of transistors within a region of the circuit, the plurality of transistors having terminals, the plurality of transistors being coupled between a power source terminal and a power sink terminal so as to be capable of admitting power between the power source terminal and the power sink terminal, the plurality of transistors being coupled so that every transistor terminal to transistor terminal coupling within the region of the circuit comprises a reconfigurable switch.

  7. Vertically stacked multi-heterostructures of layered materials for logic transistors and complementary inverters

    PubMed Central

    Yu, Woo Jong; Li, Zheng; Zhou, Hailong; Chen, Yu; Wang, Yang; Huang, Yu; Duan, Xiangfeng

    2014-01-01

    The layered materials such as graphene have attracted considerable interest for future electronics. Here we report the vertical integration of multi-heterostructures of layered materials to enable high current density vertical field-effect transistors (VFETs). An n-channel VFET is created by sandwiching few-layer molybdenum disulfide (MoS2) as the semiconducting channel between a monolayer graphene and a metal thin film. The VFETs exhibit a room temperature on-off ratio >103, while at same time deliver a high current density up to 5,000 A/cm2, sufficient for high performance logic applications. This study offers a general strategy for the vertical integration of various layered materials to obtain both p- and n-channel transistors for complementary logic functions. A complementary inverter with larger than unit voltage gain is demonstrated by vertically stacking the layered materials of graphene, Bi2Sr2Co2O8 (p-channel), graphene, MoS2 (n-channel), and metal thin film in sequence. The ability to simultaneously achieve high on-off ratio, high current density, and logic integration in the vertically stacked multi-heterostructures can open up a new dimension for future electronics to enable three-dimensional integration. PMID:23241535

  8. A high-performance complementary inverter based on transition metal dichalcogenide field-effect transistors.

    PubMed

    Cho, Ah-Jin; Park, Kee Chan; Kwon, Jang-Yeon

    2015-01-01

    For several years, graphene has been the focus of much attention due to its peculiar characteristics, and it is now considered to be a representative 2-dimensional (2D) material. Even though many research groups have studied on the graphene, its intrinsic nature of a zero band-gap, limits its use in practical applications, particularly in logic circuits. Recently, transition metal dichalcogenides (TMDs), which are another type of 2D material, have drawn attention due to the advantage of having a sizable band-gap and a high mobility. Here, we report on the design of a complementary inverter, one of the most basic logic elements, which is based on a MoS2 n-type transistor and a WSe2 p-type transistor. The advantages provided by the complementary metal-oxide-semiconductor (CMOS) configuration and the high-performance TMD channels allow us to fabricate a TMD complementary inverter that has a high-gain of 13.7. This work demonstrates the operation of the MoS2 n-FET and WSe2 p-FET on the same substrate, and the electrical performance of the CMOS inverter, which is based on a different driving current, is also measured.

  9. Seeing diabetes: visual detection of glucose based on the intrinsic peroxidase-like activity of MoS2 nanosheets

    NASA Astrophysics Data System (ADS)

    Lin, Tianran; Zhong, Liangshuang; Guo, Liangqia; Fu, Fengfu; Chen, Guonan

    2014-09-01

    Molybdenum disulfide (MoS2) has attracted increasing research interest recently due to its unique physical, optical and electrical properties, correlated with its 2D ultrathin atomic-layered structure. Until now, however, great efforts have focused on its applications such as lithium ion batteries, transistors, and hydrogen evolution reactions. Herein, for the first time, MoS2 nanosheets are discovered to possess an intrinsic peroxidase-like activity and can catalytically oxidize 3,3',5,5'-tetramethylbenzidine (TMB) by H2O2 to produce a color reaction. The catalytic activity follows the typical Michaelis-Menten kinetics and is dependent on temperature, pH, H2O2 concentration, and reaction time. Based on this finding, a highly sensitive and selective colorimetric method for H2O2 and glucose detection is developed and applied to detect glucose in serum samples. Moreover, a simple, inexpensive, instrument-free and portable test kit for the visual detection of glucose in normal and diabetic serum samples is constructed by utilizing agarose hydrogel as a visual detection platform.Molybdenum disulfide (MoS2) has attracted increasing research interest recently due to its unique physical, optical and electrical properties, correlated with its 2D ultrathin atomic-layered structure. Until now, however, great efforts have focused on its applications such as lithium ion batteries, transistors, and hydrogen evolution reactions. Herein, for the first time, MoS2 nanosheets are discovered to possess an intrinsic peroxidase-like activity and can catalytically oxidize 3,3',5,5'-tetramethylbenzidine (TMB) by H2O2 to produce a color reaction. The catalytic activity follows the typical Michaelis-Menten kinetics and is dependent on temperature, pH, H2O2 concentration, and reaction time. Based on this finding, a highly sensitive and selective colorimetric method for H2O2 and glucose detection is developed and applied to detect glucose in serum samples. Moreover, a simple, inexpensive

  10. Study of gate oxide traps in HfO2/AlGaN/GaN metal-oxide-semiconductor high-electron-mobility transistors by use of ac transconductance method

    NASA Astrophysics Data System (ADS)

    Sun, X.; Saadat, O. I.; Chang-Liao, K. S.; Palacios, T.; Cui, S.; Ma, T. P.

    2013-03-01

    We introduce an ac-transconductance method to profile the gate oxide traps in a HfO2 gated AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors (MOS-HEMTs) that can exchange carriers with metal gates, which in turn causes changes in analog and pulsed channel currents. The method extracts energy and spacial distributions of the oxide and interface traps under the gate from the frequency dependence of ac transconductance. We demonstrate the method using MOS-HEMTs with gate oxides that were annealed at different temperatures.

  11. Ammonia gas sensors based on poly (3-hexylthiophene)-molybdenum disulfide film transistors

    NASA Astrophysics Data System (ADS)

    Xie, Tao; Xie, Guangzhong; Su, Yuanjie; Hongfei, Du; Ye, Zongbiao; Jiang, Yadong

    2016-02-01

    In this work, in order to enhance the recovery performance of organic thin film transistors (OTFTs) ammonia (NH3) sensors, poly (3-hexylthiophene) (P3HT) and molybdenum disulfide (MoS2) were combined as sensitive materials. Different sensitive film structures as active layers of OTFTs, i.e., P3HT-MoS2 composite film, P3HT/MoS2 bilayer film and MoS2/P3HT bilayer film were fabricated by spray technology. OTFT gas sensors based on P3HT-MoS2 composite film showed a shorter recovery time than others when the ammonia concentration changed from 4 to 20 ppm. Specifically, x-ray diffraction (XRD), Raman and UV-visible absorption were employed to explore the interface properties between P3HT and single-layer MoS2. Through the complementary characterization, a mechanism based on charge transfer is proposed to explain the physical originality of these OTFT gas sensors: closer interlayer d-spacing and better π-π stacking of the P3HT chains in composite film have ensured a short recovery time of OTFT gas sensors. Moreover, sensing mechanisms of OTFTs were further studied by comparing the device performance in the presence of nitrogen or dry air as a carrier gas. This work not only strengthens the fundamental understanding of the sensing mechanism, but provides a promising approach to optimizing the OTFT gas sensors.

  12. Ammonia gas sensors based on poly (3-hexylthiophene)-molybdenum disulfide film transistors.

    PubMed

    Xie, Tao; Xie, Guangzhong; Su, Yuanjie; Hongfei, Du; Ye, Zongbiao; Jiang, Yadong

    2016-02-12

    In this work, in order to enhance the recovery performance of organic thin film transistors (OTFTs) ammonia (NH3) sensors, poly (3-hexylthiophene) (P3HT) and molybdenum disulfide (MoS2) were combined as sensitive materials. Different sensitive film structures as active layers of OTFTs, i.e., P3HT-MoS2 composite film, P3HT/MoS2 bilayer film and MoS2/P3HT bilayer film were fabricated by spray technology. OTFT gas sensors based on P3HT-MoS2 composite film showed a shorter recovery time than others when the ammonia concentration changed from 4 to 20 ppm. Specifically, x-ray diffraction (XRD), Raman and UV-visible absorption were employed to explore the interface properties between P3HT and single-layer MoS2. Through the complementary characterization, a mechanism based on charge transfer is proposed to explain the physical originality of these OTFT gas sensors: closer interlayer d-spacing and better π-π stacking of the P3HT chains in composite film have ensured a short recovery time of OTFT gas sensors. Moreover, sensing mechanisms of OTFTs were further studied by comparing the device performance in the presence of nitrogen or dry air as a carrier gas. This work not only strengthens the fundamental understanding of the sensing mechanism, but provides a promising approach to optimizing the OTFT gas sensors.

  13. Monolayer-molybdenum-disulfide-based nano-optomechanical transistor and tunable nonlinear responses

    NASA Astrophysics Data System (ADS)

    Huajun, Chen; Changzhao, Chen; Yang, Li; Xianwen, Fang

    2016-11-01

    Atomically thin two-dimensional semiconductor nanomaterials have attained considerable attention currently. Here, we present a nano-optomechanical system based on a suspended monolayer molybdenum disulfide (MoS2). The linear and nonlinear coherent optical properties of this system, and the phenomenon of phonon-induced transparency are demonstrated. The transmission of the probe field can be manipulated by the power of a second ‘gating’ (pump) field, which indicates a promising candidate for an optical transistor. We further study the nonlinear effect of the system, and the optical Kerr effect of the monolayer MoS2 resonator can be regulated under different parameter regimes. This scheme proposed here may indicate potential chip-scale applications of monolayer MoS2 resonator in quantum information with the currently popular pump-probe technology. Project supported by the National Natural Science Foundation of China (Nos. 11404005, 51502005, 61272153, 61572035), the Key Foundation for Young Talents in College of Anhui Province (No. 2013SQRL026ZD), and the Foundation for PhD in Anhui University of Science and Technology.

  14. Chemistry of MOS-LSI radiation hardening

    NASA Technical Reports Server (NTRS)

    Grunthaner, P.

    1985-01-01

    The objective of this task was to obtain chemical information on MOS test samples. Toward this end, high resolution X-ray photoemission spectroscopy (XPS) has been the primary techniques used to characterize the chemistry and structure of the SiO2/Si interface for a variety of MOS structures with differing degrees of susceptibility to damage by ionizing radiation. The major accomplishments of this program are: (1) the identification of a structurally distinct region of SiO2 in the near-interfacial region of thermal SiO2 on Si; (2) the identification in the near-interfacial region of SiO2 structural differences between radiation hard and soft gate oxides; (3) the direct observation of radiation-induced damage sites in thermal SiO2 with XPS using in situ electron stress; (4) the correlation of suboxide state distributions at the SiO2/Si interface with processing parameters and radiation susceptibility; (5) the development of a chemical mechanism for radiation-induced interface state generation in SiO2/Si structures; and (6) the development benign chemical profiling techniques which permit the investigation of oxide/semiconductor structures using surface sensitive electron spectroscopic techniques.

  15. Gate-defined Single Electron Transistor in a Graphene-MoS2 van der Waals Heterostructure

    NASA Astrophysics Data System (ADS)

    Wang, Ke; Taniguchi, Takashi; Watanabe, Kenji; Kim, Philip

    We report experimental demonstration of fabrication of laterally confined single electron transistor (SET) on MoS2 transition metal dichalcogenide (TMDC) semiconductor. A few atomic layers of MoS2 single crystals are encapsulated in hBN layers in order to improve mobility of 2-dimensional (2D) electron channel. Graphene layers are employed to provide Ohmic contact to the TMDC channels. The laterally confined quantum dots are formed by electrostatically depleting the near-by 2D channel employing local gate fabricated by electron lithography. Typical SET transport signatures such as gate-tunable Coulomb blockade have been observed. We have demonstrated the quantum confinement can be sensitively tuned to adjust the dot-reservoir coupling. The work paves way for more complicated device structure such as valley-spin filter and vertically coupled quantum dots in Coulomb drag devices.

  16. Paper field effect transistor

    NASA Astrophysics Data System (ADS)

    Fortunato, E.; Correia, Nuno; Barquinha, Pedro; Costa, Cláudia; Pereira, Luís; Gonçalves, Gonçalo; Martins, Rodrigo

    2009-02-01

    In this paper we report the use of a sheet of cellulose fiber-based paper as the dielectric layer used in oxide based semiconductor thin film field-effect transistors (FETs). In this new approach we are using the cellulose fiber-based paper in an "interstrate" structure since the device is build on both sides of the cellulose sheet. Such hybrid FETs present excellent operating characteristics such as high channel saturation mobility (>30 cm2/Vs), drain-source current on/off modulation ratio of approximately 104, near-zero threshold voltage, enhancement n-type operation and sub-threshold gate voltage swing of 0.8 V/decade. The cellulose fiber-based paper FETs characteristics have been measured in air ambient conditions and present good stability. The obtained results outpace those of amorphous Si TFTs and rival with the same oxide based TFTs produced on either glass or crystalline silicon substrates. The compatibility of these devices with large-scale/large-area deposition techniques and low cost substrates as well as their very low operating bias delineates this as a promising approach to attain high-performance disposable electronics like paper displays, smart labels, smart packaging, RFID and point-of-care systems for self analysis in bio-applications, among others.

  17. Passivated ambipolar black phosphorus transistors

    NASA Astrophysics Data System (ADS)

    Yue, Dewu; Lee, Daeyeong; Jang, Young Dae; Choi, Min Sup; Nam, Hye Jin; Jung, Duk-Young; Yoo, Won Jong

    2016-06-01

    We report the first air-passivated ambipolar BP transistor formed by applying benzyl viologen, which serves as a surface charge transfer donor for BP flakes. The passivated BP devices exhibit excellent stability under both an ambient atmosphere and vacuum; their transistor performance is maintained semi-permanently. Unlike their intrinsic p-type properties, passivated BP devices present advantageous ambipolar properties with much higher electron mobility up to ~83 cm2 V-1 s-1 from 2-terminal measurement at 300 K, compared to other reported studies on n-type BP transistors. On the basis of the n-type doping effect that originated from benzyl viologen, we also systematically investigated the BP thickness dependence of our devices on electrical properties, in which we found the best electron transport performance to be attained when an ~10 nm thick BP flake was used.We report the first air-passivated ambipolar BP transistor formed by applying benzyl viologen, which serves as a surface charge transfer donor for BP flakes. The passivated BP devices exhibit excellent stability under both an ambient atmosphere and vacuum; their transistor performance is maintained semi-permanently. Unlike their intrinsic p-type properties, passivated BP devices present advantageous ambipolar properties with much higher electron mobility up to ~83 cm2 V-1 s-1 from 2-terminal measurement at 300 K, compared to other reported studies on n-type BP transistors. On the basis of the n-type doping effect that originated from benzyl viologen, we also systematically investigated the BP thickness dependence of our devices on electrical properties, in which we found the best electron transport performance to be attained when an ~10 nm thick BP flake was used. Electronic supplementary information (ESI) available: Transfer characteristics of BP field effect transistors (BV1-BV4) (Fig. S1 and S2 and Table S1); output characteristics of BP field effect transistors in different directions (Fig. S3

  18. Simple circuit reduces transistor switching time

    NASA Technical Reports Server (NTRS)

    1965-01-01

    Silicon-Controlled Rectifier /SCR/, gated by a voltage divider, controls the potentiometer in transistorized switching circuits. The SCR acts as a gate to trigger the switching transistor only when the input signal reaches an amplitude that will switch the transistor rapidly.

  19. Imaging spectroscopic ellipsometry of MoS2

    NASA Astrophysics Data System (ADS)

    Funke, S.; Miller, B.; Parzinger, E.; Thiesen, P.; Holleitner, A. W.; Wurstbauer, U.

    2016-09-01

    Micromechanically exfoliated mono- and multilayers of molybdenum disulfide (MoS2) are investigated by spectroscopic imaging ellipsometry. In combination with knife edge illumination, MoS2 flakes can be detected and classified on arbitrary flat and also transparent substrates with a lateral resolution down to 1-2 µm. The complex dielectric functions from mono- and trilayer MoS2 are presented. They are extracted from a multilayer model to fit the measured ellipsometric angles employing an anisotropic and an isotropic fit approach. We find that the energies of the critical points of the optical constants can be treated to be independent of the utilized model, whereas the magnitude of the optical constants varies with the used model. The anisotropic model suggests a maximum absorbance for a MoS2 sheet supported by sapphire of about 14% for monolayer and of 10% for trilayer MoS2. Furthermore, the lateral homogeneity of the complex dielectric function for monolayer MoS2 is investigated with a spatial resolution of 2 µm. Only minor fluctuations are observed. No evidence for strain, for a significant amount of disorder or lattice defects can be found in the wrinkle-free regions of the MoS2 monolayer from complementary µ-Raman spectroscopy measurements. We assume that the minor lateral variation in the optical constants are caused by lateral modification in the van der Waals interaction presumably caused by the preparation using micromechanical exfoliation and viscoelastic stamping.

  20. Magnetic Vortex Based Transistor Operations

    PubMed Central

    Kumar, D.; Barman, S.; Barman, A.

    2014-01-01

    Transistors constitute the backbone of modern day electronics. Since their advent, researchers have been seeking ways to make smaller and more efficient transistors. Here, we demonstrate a sustained amplification of magnetic vortex core gyration in coupled two and three vortices by controlling their relative core polarities. This amplification is mediated by a cascade of antivortex solitons travelling through the dynamic stray field. We further demonstrated that the amplification can be controlled by switching the polarity of the middle vortex in a three vortex sequence and the gain can be controlled by the input signal amplitude. An attempt to show fan–out operation yielded gain for one of the symmetrically placed branches which can be reversed by switching the core polarity of all the vortices in the network. The above observations promote the magnetic vortices as suitable candidates to work as stable bipolar junction transistors (BJT). PMID:24531235

  1. Magnetic vortex based transistor operations.

    PubMed

    Kumar, D; Barman, S; Barman, A

    2014-02-17

    Transistors constitute the backbone of modern day electronics. Since their advent, researchers have been seeking ways to make smaller and more efficient transistors. Here, we demonstrate a sustained amplification of magnetic vortex core gyration in coupled two and three vortices by controlling their relative core polarities. This amplification is mediated by a cascade of antivortex solitons travelling through the dynamic stray field. We further demonstrated that the amplification can be controlled by switching the polarity of the middle vortex in a three vortex sequence and the gain can be controlled by the input signal amplitude. An attempt to show fan-out operation yielded gain for one of the symmetrically placed branches which can be reversed by switching the core polarity of all the vortices in the network. The above observations promote the magnetic vortices as suitable candidates to work as stable bipolar junction transistors (BJT).

  2. High current gain transistor laser

    PubMed Central

    Liang, Song; Qiao, Lijun; Zhu, Hongliang; Wang, Wei

    2016-01-01

    A transistor laser (TL), having the structure of a transistor with multi-quantum wells near its base region, bridges the functionality gap between lasers and transistors. However, light emission is produced at the expense of current gain for all the TLs reported up to now, leading to a very low current gain. We propose a novel design of TLs, which have an n-doped InP layer inserted in the emitter ridge. Numerical studies show that a current flow aperture for only holes can be formed in the center of the emitter ridge. As a result, the common emitter current gain can be as large as 143.3, which is over 15 times larger than that of a TL without the aperture. Besides, the effects of nonradiative recombination defects can be reduced greatly because the flow of holes is confined in the center region of the emitter ridge. PMID:27282466

  3. Recovery of damage in rad-hard MOS devices during and after irradiation by electrons, protons, alphas, and gamma rays

    NASA Technical Reports Server (NTRS)

    Brucker, G. J.; Van Gunten, O.; Stassinopoulos, E. G.; Shapiro, P.; August, L. S.; Jordan, T. M.

    1983-01-01

    This paper reports on the recovery properties of rad-hard MOS devices during and after irradiation by electrons, protons, alphas, and gamma rays. The results indicated that complex recovery properties controlled the damage sensitivities of the tested parts. The results also indicated that damage sensitivities depended on dose rate, total dose, supply bias, gate bias, transistor type, radiation source, and particle energy. The complex nature of these dependencies make interpretation of LSI device performance in space (exposure to entire electron and proton spectra) difficult, if not impossible, without respective ground tests and analyses. Complete recovery of n-channel shifts was observed, in some cases within hours after irradiation, with equilibrium values of threshold voltages greater than their pre-irradiation values. This effect depended on total dose, radiation source, and gate bias during exposure. In contrast, the p-channel shifts recovered only 20 percent within 30 days after irradiation.

  4. Effect of edge roughness on electronic transport in graphene nanoribbon channel metal-oxide-semiconductor field-effect transistors

    NASA Astrophysics Data System (ADS)

    Basu, D.; Gilbert, M. J.; Register, L. F.; Banerjee, S. K.; MacDonald, A. H.

    2008-01-01

    Results of quantum mechanical simulations of the influence of edge disorder on transport in graphene nanoribbon metal-oxide-semiconductor field-effect transistors (MOSFETs) are reported. The addition of edge disorder significantly reduces ON-state currents and increases OFF-state currents, and introduces wide variability across devices. These effects decrease as ribbon widths increase and as edges become smoother. However, the band gap decreases with increasing width, thereby increasing the band-to-band tunneling mediated subthreshold leakage current even with perfect nanoribbons. These results suggest that without atomically precise edge control during fabrication, MOSFET performance gains through use of graphene will be difficult to achieve in complementary MOS applications.

  5. Exciton dynamics in a single layer MoS2

    NASA Astrophysics Data System (ADS)

    Kim, Jonghwan; Hong, Xiaoping; Shi, Sufei; Jin, Chenhao; Sun, Yinghui; Wang, Feng

    2014-03-01

    In a low dimensional semiconductor, exciton plays a crucial role in the optical property. Recently, a single layer of MoS2 has attracted significant attention due to its unique excitonic features. For example, exciton in MoS2 is predicted to have order of magnitude larger binding energy than conventional direct band gap material. For deeper understanding on such properties, however, it is important to understand how exciton is formed and decays in time domain. Our work on exciton dynamics in MoS2 by pump probe spectroscopy will be presented with control of both power and wavelength.

  6. Crystallinity of RF-Sputtered MoS2 Films.

    DTIC Science & Technology

    1988-04-15

    RF-Sputtered c MoS2 Films fl 0) J. R. LINCE and PAUL D. FLEISCHAUER Chemistry and Physics Laboratory ’ Laboratory Operations The Aerospace Corporation...block number) The crystallinity and morphology of thin, radio-frequency (rf)-sputtered MoS2 films deposited on 440C stainless steel substrates at both...and 8-20 scans). Under SEM, the films exhibited 4, "ridgelike" (or platelike) formation region for thicknesses between 0.18 and 1.0 m MoS2 . X-ray

  7. Programmable, automated transistor test system

    NASA Technical Reports Server (NTRS)

    Truong, L. V.; Sundburg, G. R.

    1986-01-01

    A programmable, automated transistor test system was built to supply experimental data on new and advanced power semiconductors. The data will be used for analytical models and by engineers in designing space and aircraft electric power systems. A pulsed power technique was used at low duty cycles in a nondestructive test to examine the dynamic switching characteristic curves of power transistors in the 500 to 1000 V, 10 to 100 A range. Data collection, manipulation, storage, and output are operator interactive but are guided and controlled by the system software.

  8. Bipolar Transistor Based on Graphane

    NASA Astrophysics Data System (ADS)

    Gharekhanlou, B.; Tousaki, S. B.; Khorasani, S.

    2010-11-01

    Graphane is a semiconductor with an energy gap, obtained from hydrogenation of the two-dimensional grapheme sheet. Together with the two-dimensional geometry, unique transport features of graphene, and possibility of doping graphane, p and n regions can be defined so that p-n junctions become feasible with small reverse currents. Our recent analysis has shown that an ideal I-V characteristic for this type of junctions may be expected. Here, we predict the behavior of bipolar juncrion transistors based on graphane. Profiles of carriers and intrinsic parameters of the graphane transistor are calculated and discussed.

  9. Modellierungskonzept für MOS Varaktoren zur Minimierung der AM-FM Konversion in VCOs

    NASA Astrophysics Data System (ADS)

    Peikert, T.; Bremer, J.-K.; Mathis, W.

    2010-10-01

    In dieser Arbeit wird ein analytisches Simulationsmodell für MOS Varaktoren zur Entwurfsunterstützung von integrierten CMOS LC-Tank VCO-Schaltungen präsentiert. Das analytische Simulationsmodell wurde auf Basis des EKV-Transistormodells implementiert und beinhaltet ausschließlich Design- und Prozessparameter für die Berechnung der Varaktorkapazität. Dieses Simulationsmodell ermöglicht es, die verwendeten Varaktoren im Vorfeld des VCO-Entwurfs zu dimensionieren, die effektive Großsignalkapazität in Abhängigkeit des Ausgangssignals zu berechnen und einzelne Eigenschaften der Varaktoren, wie z.B. das AM-FM Konversionsverhalten zu optimieren. Die Gültigkeit des vorgestellten analytischen Simulationsmodells zur Beschreibung der Varaktorkapazität in CMOS LC-Tank VCOs, wird anhand von Spectre (Cadence) Simulationen auf Basis eines 0.25 μm CMOS Prozesses der Firma IHP (SGB25) und eines 0.35 μm CMOS Prozesses der Firma AMS (C35) verifiziert. In this work an analytical simulation model for MOS varactors, that can be used in a systematically VCO design flow, is presented. The simulation model is based on the EKV transistor model and includes only design and process parameters of the used CMOS technology. The proposed simulation model allows calculating the required design parameters and the effective large signal capacitance of the varactors incorporated into the VCO as a function of the output signal of the VCO. Based on the expression for the effective large signal capacitance it is possible to optimize the AM-FM conversion behavior of the used varactors. The validity and accuracy of the simulation model is verified by Spectre simulations which are based on a 0.25 μm CMOS process (SGB25) from the company IHP and a 0.35 μm CMOS process (C35) from the company AMS. The simulation results show a good accordance in all transistor operating regions for NMOS varactors as well as PMOS varactors.

  10. Silicon on insulator self-aligned transistors

    DOEpatents

    McCarthy, Anthony M.

    2003-11-18

    A method for fabricating thin-film single-crystal silicon-on-insulator (SOI) self-aligned transistors. Standard processing of silicon substrates is used to fabricate the transistors. Physical spaces, between the source and gate, and the drain and gate, introduced by etching the polysilicon gate material, are used to provide connecting implants (bridges) which allow the transistor to perform normally. After completion of the silicon substrate processing, the silicon wafer is bonded to an insulator (glass) substrate, and the silicon substrate is removed leaving the transistors on the insulator (glass) substrate. Transistors fabricated by this method may be utilized, for example, in flat panel displays, etc.

  11. Experimental study on vertical scaling of InAs-on-insulator metal-oxide-semiconductor field-effect transistors

    SciTech Connect

    Kim, SangHyeon E-mail: sh-kim@kist.re.kr; Yokoyama, Masafumi; Nakane, Ryosho; Takenaka, Mitsuru; Takagi, Shinichi; Ichikawa, Osamu; Osada, Takenori; Hata, Masahiko

    2014-06-30

    We have investigated effects of the vertical scaling on electrical properties in extremely thin-body InAs-on-insulator (-OI) metal-oxide-semiconductor field-effect transistors (MOSFETs). It is found that the body thickness (T{sub body}) scaling provides better short channel effect (SCE) control, whereas the T{sub body} scaling also causes the reduction of the mobility limited by channel thickness fluctuation (δT{sub body}) scattering (μ{sub fluctuation}). Also, in order to achieve better SCEs control, the thickness of InAs channel layer (T{sub channel}) scaling is more favorable than the thickness of MOS interface buffer layer (T{sub buffer}) scaling from a viewpoint of a balance between SCEs control and μ{sub fluctuation} reduction. These results indicate necessity of quantum well channel structure in InAs-OI MOSFETs and these should be considered in future transistor design.

  12. Electronic system for data acquisition to study radiation effects on operating MOSFET transistors

    SciTech Connect

    Alves de Oliveira, Juliano; Assis de Melo, Marco Antônio; Guazzelli da Silveira, Marcilei A.; Medina, Nilberto H.

    2014-11-11

    In this work we present the development of an acquisition system for characterizing transistors under X-ray radiation. The system is able to carry out the acquisition and to storage characteristic transistor curves. To test the acquisition system we have submitted polarized P channel MOS transistors under continuous 10-keV X-ray doses up to 1500 krad. The characterization system can operate in the saturation region or in the linear region in order to observe the behavior of the currents or voltages involved during the irradiation process. Initial tests consisted of placing the device under test (DUT) in front of the X-ray beam direction, while its drain current was constantly monitored through the prototype generated in this work, the data are stored continuously and system behavior was monitored during the test. In order to observe the behavior of the DUT during the radiation tests, we used an acquisition system that consists of an ultra-low consumption16-bit Texas Instruments MSP430 microprocessor. Preliminary results indicate linear behavior of the voltage as a function of the exposure time and fast recovery. These features may be favorable to use this device as a radiation dosimeter to monitor low rate X-ray.

  13. Scalable fabrication of a hybrid field-effect and acousto-electric device by direct growth of monolayer MoS2/LiNbO3

    PubMed Central

    Preciado, Edwin; Schülein, Florian J.R.; Nguyen, Ariana E.; Barroso, David; Isarraraz, Miguel; von Son, Gretel; Lu, I-Hsi; Michailow, Wladislaw; Möller, Benjamin; Klee, Velveth; Mann, John; Wixforth, Achim; Bartels, Ludwig; Krenner, Hubert J.

    2015-01-01

    Lithium niobate is the archetypical ferroelectric material and the substrate of choice for numerous applications including surface acoustic wave radio frequencies devices and integrated optics. It offers a unique combination of substantial piezoelectric and birefringent properties, yet its lack of optical activity and semiconducting transport hamper application in optoelectronics. Here we fabricate and characterize a hybrid MoS2/LiNbO3 acousto-electric device via a scalable route that uses millimetre-scale direct chemical vapour deposition of MoS2 followed by lithographic definition of a field-effect transistor structure on top. The prototypical device exhibits electrical characteristics competitive with MoS2 devices on silicon. Surface acoustic waves excited on the substrate can manipulate and probe the electrical transport in the monolayer device in a contact-free manner. We realize both a sound-driven battery and an acoustic photodetector. Our findings open directions to non-invasive investigation of electrical properties of monolayer films. PMID:26493867

  14. Comparative studies of AlGaN/GaN MOS-HEMTs with stacked gate dielectrics by the mixed thin film growth method

    NASA Astrophysics Data System (ADS)

    Chou, Bo-Yi; Hsu, Wei-Chou; Lee, Ching-Sung; Liu, Han-Yin; Ho, Chiu-Sheng

    2013-07-01

    This paper reports Al0.27Ga0.73N/GaN metal-oxide-semiconductor high electron mobility transistors (MOS-HEMTs) with stacked Al2O3/HfO2 gate dielectrics by using hydrogen peroxideoxidation/sputtering techniques. The Al2O3 employed as a gate dielectric and surface passivation layer effectively suppresses the gate leakage current, improves RF drain current collapse and exhibits good thermal stability. Moreover, by stacking the good insulating high-k HfO2 dielectric further suppresses the gate leakage, enhances the dielectric breakdown field and power-added efficiency, and decreases the equivalent oxide thickness. The present MOS-HEMT design has demonstrated superior improvements of 10.1% (16.4%) in the maximum drain-source current (IDS, max), 11.4% (22.5%) in the gate voltage swing and 12.5%/14.4% (21.9%/22.3%) in the two-terminal gate-drain breakdown/turn-on voltages (BVGD/VON), and the present design also demonstrates the lowest gate leakage current and best thermal stability characteristics as compared to two reference MOS-HEMTs with a single Al2O3/(HfO2) dielectric layer of the same physical thickness.

  15. Scalable fabrication of a hybrid field-effect and acousto-electric device by direct growth of monolayer MoS2/LiNbO3.

    PubMed

    Preciado, Edwin; Schülein, Florian J R; Nguyen, Ariana E; Barroso, David; Isarraraz, Miguel; von Son, Gretel; Lu, I-Hsi; Michailow, Wladislaw; Möller, Benjamin; Klee, Velveth; Mann, John; Wixforth, Achim; Bartels, Ludwig; Krenner, Hubert J

    2015-10-23

    Lithium niobate is the archetypical ferroelectric material and the substrate of choice for numerous applications including surface acoustic wave radio frequencies devices and integrated optics. It offers a unique combination of substantial piezoelectric and birefringent properties, yet its lack of optical activity and semiconducting transport hamper application in optoelectronics. Here we fabricate and characterize a hybrid MoS2/LiNbO3 acousto-electric device via a scalable route that uses millimetre-scale direct chemical vapour deposition of MoS2 followed by lithographic definition of a field-effect transistor structure on top. The prototypical device exhibits electrical characteristics competitive with MoS2 devices on silicon. Surface acoustic waves excited on the substrate can manipulate and probe the electrical transport in the monolayer device in a contact-free manner. We realize both a sound-driven battery and an acoustic photodetector. Our findings open directions to non-invasive investigation of electrical properties of monolayer films.

  16. Scalable fabrication of a hybrid field-effect and acousto-electric device by direct growth of monolayer MoS2/LiNbO3

    NASA Astrophysics Data System (ADS)

    Preciado, Edwin; Schülein, Florian J. R.; Nguyen, Ariana E.; Barroso, David; Isarraraz, Miguel; von Son, Gretel; Lu, I.-Hsi; Michailow, Wladislaw; Möller, Benjamin; Klee, Velveth; Mann, John; Wixforth, Achim; Bartels, Ludwig; Krenner, Hubert J.

    2015-10-01

    Lithium niobate is the archetypical ferroelectric material and the substrate of choice for numerous applications including surface acoustic wave radio frequencies devices and integrated optics. It offers a unique combination of substantial piezoelectric and birefringent properties, yet its lack of optical activity and semiconducting transport hamper application in optoelectronics. Here we fabricate and characterize a hybrid MoS2/LiNbO3 acousto-electric device via a scalable route that uses millimetre-scale direct chemical vapour deposition of MoS2 followed by lithographic definition of a field-effect transistor structure on top. The prototypical device exhibits electrical characteristics competitive with MoS2 devices on silicon. Surface acoustic waves excited on the substrate can manipulate and probe the electrical transport in the monolayer device in a contact-free manner. We realize both a sound-driven battery and an acoustic photodetector. Our findings open directions to non-invasive investigation of electrical properties of monolayer films.

  17. The four-gate transistor

    NASA Technical Reports Server (NTRS)

    Mojarradi, M. M.; Cristoveanu, S.; Allibert, F.; France, G.; Blalock, B.; Durfrene, B.

    2002-01-01

    The four-gate transistor or G4-FET combines MOSFET and JFET principles in a single SOI device. Experimental results reveal that each gate can modulate the drain current. Numerical simulations are presented to clarify the mechanisms of operation. The new device shows enhanced functionality, due to the combinatorial action of the four gates, and opens rather revolutionary applications.

  18. Extended life testing evaluation of complementary MOS integrated circuits

    NASA Technical Reports Server (NTRS)

    Brosnan, T. E.

    1972-01-01

    The purpose of the extended life testing evaluation of complementary MOS integrated circuits was twofold: (1) To ascertain the long life capability of complementary MOS devices. (2) To assess the objectivity and reliability of various accelerated life test methods as an indication or prediction tool. In addition, the determination of a suitable life test sequence for these devices was of importance. Conclusions reached based on the parts tested and the test results obtained was that the devices were not acceptable.

  19. Optical absorptions of polyfluorene transistors

    NASA Astrophysics Data System (ADS)

    Deng, Yvonne Y.; Sirringhaus, Henning

    2005-07-01

    Conjugated polymers are a promising class of materials for organic electronics. While the progress in device performance is impressive, the basics of charge transport still pose many open questions. Specifically, conduction at the comparatively rough polymer-polymer interface in an all-polymer field-effect transistor is expected to be different from a sharp interface with an inorganic dielectric, such as silicon dioxide. In this work, charge modulation spectroscopy (CMS) is used to study the optical absorptions in the presence of charges in situ in the transistor structure. This allows direct observation of the charge carriers in the operational device via their spectroscopic signature; the technique is by design very sensitive to the properties of the semiconductor-dielectric interface. The semiconducting copolymer poly( 9,9' -dioctyl-fluorene-co-bithiophene) (F8T2) is incorporated into a top-gate thin-film transistor structure with a polymer dielectric layer deposited by spin coating and inkjet-printed polymer electrodes. A prominent charge-induced absorption at 1.65eV is observed as well as a shoulder at 1.3eV and a tail extending toward the absorption edge. The bias dependence of the CMS signature confirms that intermixing of the polymer layers is minimal, as expected from the excellent transistor characteristics. Polarization-dependent CMS measurements on aligned transistors show that the main feature at 1.65eV is strongly polarized whereas the shoulder is unpolarized. This observation, as well as further experimental evidence, lead to the conclusion that while the main absorption is attributable to the intrinsic, polaronic absorption in F8T2, the shoulder is likely to originate from a defect state.

  20. Friction on a single MoS2 nanotube

    PubMed Central

    2012-01-01

    Friction was measured on a single molybdenum disulfide (MoS2) nanotube and on a single MoS2 nano-onion for the first time. We used atomic force microscopy (AFM) operating in ultra-high vacuum at room temperature. The average coefficient of friction between the AFM tip and MoS2 nanotubes was found considerably below the corresponding values obtained from an air-cleaved MoS2 single crystal or graphite. We revealed a nontrivial dependency of friction on interaction strength between the nanotube and the underlying substrate. Friction on detached or weakly supported nanotubes by the substrate was several times smaller (0.023 ± 0.005) than that on well-supported nanotubes (0.08 ± 0.02). We propose an explanation of a quarter of a century old phenomena of higher friction found for intracrystalline (0.06) than for intercrystalline slip (0.025) in MoS2. Friction test on a single MoS2 nano-onion revealed a combined gliding-rolling process. PACS, 62.20, 61.46.Fg, 68.37 Ps PMID:22490562

  1. Interaction between genes Mos and mwh expressed in somatic cells of Drosophila melanogaster

    SciTech Connect

    Vaisman, N.Ya.; Zakharov, I.K.

    1995-07-01

    Gene Mosaic (Mos) of chromosome 3 of Drosophila melanogaster was located by means of dominant markers Ly, Sb, and Dr. This gene was shown to be located between Ly and Sb in the centromeric region (45-50 map units). An analysis of interaction between Mos and mwh genes in cis- and trans-heterozygotes showed a significant effect of the Mos gene on mutability (recombinogenesis) of chromosome mwh in somatic cells. In the cis heterozygote mwh Mos/++, the frequency of small mutant clones on wings of flies increased. In mwh/Mos heterozygotes, the Mos gene caused a significant reduction of dorsocentral and scutellar bristles (78% in mwh/Mos, 85% in mwh +/+ Mos, and 98% in mwh Mos/mwh +). 20 refs., 3 tabs.

  2. v-mos proteins encoded by myeloproliferative sarcoma virus and its ts159 mutant.

    PubMed Central

    Singh, B; Stocking, C; Walker, R; Yang, Y D; Ostertag, W; Arlinghaus, R B

    1992-01-01

    The myeloproliferative sarcoma virus (MPSV) v-mos protein was predicted to be identical in size to p39c-mos because of an observed one-base deletion in the seventh codon of the env-mos open reading frame, which would allow translation to initiate at the methionine equivalent to codon 32 of the env-mos gene. On the basis of published results, p39c-mos is known to have greatly reduced in vitro protein kinase activity compared with p37env-mos encoded by Moloney murine sarcoma virus. Unexpectedly, the relative activity of the MPSV v-mos protein kinase was comparable to that of p37env-mos. Consistent with this finding, the size of MPSV v-mos protein was found to be similar to the size of p37env-mos. Moreover, the pattern and sizes of phosphorylated bands produced by autophosphorylation of the MPSV v-mos protein were similar to those of p37env-mos. These results were confirmed by in vitro transcription-translation of the MPSV v-mos gene. Resequencing portions of the MPSV mos gene failed to show the deletion within codon 7. Except for the codon 262 deletion, other mutations characteristic of MPSV and temperature-sensitive MPSV v-mos genes were confirmed. A glycine-to-arginine mutation at residue 338 of the MPSV env-mos sequence, previously shown to cause thermosensitivity of the mutant virus (termed ts159) transforming function, yielded a v-mos protein that had significantly reduced protein kinase activity in vitro. These findings indicate that MPSV, like other Moloney murine sarcoma virus strains, also encodes a functional env-mos protein. Images PMID:1309903

  3. Ab initio studies of phosphorene island single electron transistor

    NASA Astrophysics Data System (ADS)

    Ray, S. J.; Venkata Kamalakar, M.; Chowdhury, R.

    2016-05-01

    Phosphorene is a newly unveiled two-dimensional crystal with immense potential for nanoelectronic and optoelectronic applications. Its unique electronic structure and two dimensionality also present opportunities for single electron devices. Here we report the behaviour of a single electron transistor (SET) made of a phosphorene island, explored for the first time using ab initio calculations. We find that the band gap and the charging energy decrease monotonically with increasing layer numbers due to weak quantum confinement. When compared to two other novel 2D crystals such as graphene and MoS2, our investigation reveals larger adsorption energies of gas molecules on phosphorene, which indicates better a sensing ability. The calculated charge stability diagrams show distinct changes in the presence of an individual molecule which can be applied to detect the presence of different molecules with sensitivity at a single molecular level. The higher charging energies of the molecules within the SET display operational viability at room temperature, which is promising for possible ultra sensitive detection applications.

  4. A SPICE Model and Electrostatic Field Analysis of the MOS Turn-Off Thyristor

    SciTech Connect

    Kelly, D Q; Mayhall, D J; Wilson, M J; Lahowe, D A

    2002-08-05

    This paper presents a circuit model and an electrostatic field analysis with an approximate model of the SDM170HK MOS turn-off thyristor (MTO) fabricated by Silicon Power Corporation. The circuit model consists of five cells, each containing two bipolar junction transistors and three resistors. The turn-off feature of the MTO was simulated by inserting an array of 21 Fairchild FDS6670A MOSFET importable sub-circuit components between the cathode and the turn-on gate. The model was then used to create a four-terminal sub-circuit component representing the MTO that can be readily imported into computer-aided circuit design programs such as PSPICE and Micro-Cap. The generated static I-V characteristics and simulated switching waveforms are shown. The electrostatic field analysis was done for the maximum operating voltage of 4.5 kV using the Ansoft Maxwell 3D field simulator. Electrostatic field magnitudes that exceed the nominal air breakdown threshold of 30 kV/cm were observed surrounding the simulated turn-off gate wire, the turn-off gate ring contact, and the cathode ring contact. The resulting areas of high fields are a concern, as arc track marks have been found on the inner surface of the ceramic insulator near the internal gate connections of a failed device.

  5. A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors

    NASA Astrophysics Data System (ADS)

    Krylov, Igor; Pokroy, Boaz; Eizenberg, Moshe; Ritter, Dan

    2016-09-01

    We compare the electrical properties of HfO2/Al2O3 nano-laminates with those of the ternary HfxAlyO compound in metal oxide semiconductor (MOS) capacitors. The dielectrics were deposited by atomic layer deposition on InGaAs. Water, ozone, and oxygen plasma were tested as oxygen precursors, and best results were obtained using water. The total dielectric thickness was kept constant in our experiments. It was found that the effective dielectric constant increased and the leakage current decreased with the number of periods. Best results were obtained for the ternary compound. The effect of the sublayer thicknesses on the electrical properties of the interface was carefully investigated, as well as the role of post-metallization annealing. Possible explanations for the observed trends are provided. We conclude that the ternary HfxAlyO compound is more favorable than the nano-laminates approach for InGaAs based MOS transistor applications.

  6. Protection of MOS capacitors during anodic bonding

    NASA Astrophysics Data System (ADS)

    Schjølberg-Henriksen, K.; Plaza, J. A.; Rafí, J. M.; Esteve, J.; Campabadal, F.; Santander, J.; Jensen, G. U.; Hanneborg, A.

    2002-07-01

    We have investigated the electrical damage by anodic bonding on CMOS-quality gate oxide and methods to prevent this damage. n-type and p-type MOS capacitors were characterized by quasi-static and high-frequency CV-curves before and after anodic bonding. Capacitors that were bonded to a Pyrex wafer with 10 μm deep cavities enclosing the capacitors exhibited increased leakage current and interface trap density after bonding. Two different methods were successful in protecting the capacitors from such damage. Our first approach was to increase the cavity depth from 10 μm to 50 μm, thus reducing the electric field across the gate oxide during bonding from approximately 2 × 105 V cm-1 to 4 × 104 V cm-1. The second protection method was to coat the inside of a 10 μm deep Pyrex glass cavity with aluminium, forming a Faraday cage that removed the electric field across the cavity during anodic bonding. Both methods resulted in capacitors with decreased interface trap density and unchanged leakage current after bonding. No change in effective oxide charge or mobile ion contamination was observed on any of the capacitors in the study.

  7. Tuning on-off current ratio and field-effect mobility in a MoS(2)-graphene heterostructure via Schottky barrier modulation.

    PubMed

    Shih, Chih-Jen; Wang, Qing Hua; Son, Youngwoo; Jin, Zhong; Blankschtein, Daniel; Strano, Michael S

    2014-06-24

    Field-effect transistor (FET) devices composed of a MoS2-graphene heterostructure can combine the advantages of high carrier mobility in graphene with the permanent band gap of MoS2 for digital applications. Herein, we investigate the electron transfer, photoluminescence, and gate-controlled carrier transport in such a heterostructure. We show that the junction is a Schottky barrier, whose height can be artificially controlled by gating or doping graphene. When the applied gate voltage (or the doping level) is zero, the photoexcited electron-hole pairs in monolayer MoS2 can be split by the heterojunction, significantly reducing the photoluminescence. By applying negative gate voltage (or p-doping) in graphene, the interlayer impedance formed between MoS2 and graphene exhibits an 100-fold increase. For the first time, we show that the gate-controlled interlayer Schottky impedance can be utilized to modulate carrier transport in graphene, significantly depleting the hole transport, but preserving the electron transport. Accordingly, we demonstrate a new type of FET device, which enables a controllable transition from NMOS digital to bipolar characteristics. In the NMOS digital regime, we report a very high room temperature on/off current ratio (ION/IOFF ∼ 36) in comparison to graphene-based FET devices without sacrificing the field-effect electron mobilities in graphene. By engineering the source/drain contact area, we further estimate that a higher value of ION/IOFF up to 100 can be obtained in the device architecture considered. The device architecture presented here may enable semiconducting behavior in graphene for digital and analogue electronics.

  8. Investigations of AlGaN/GaN MOS-HEMT with Al2O3 deposition by ultrasonic spray pyrolysis method

    NASA Astrophysics Data System (ADS)

    Chou, Bo-Yi; Hsu, Wei-Chou; Liu, Han-Yin; Lee, Ching-Sung; Wu, Yu-Sheng; Sun, Wen-Ching; Wei, Sung-Yen; Yu, Sheng-Min; Chiang, Meng-Hsueh

    2015-01-01

    This work investigates Al2O3/AlGaN/GaN metal-oxide-semiconductor high electron mobility transistors (MOS-HEMTs) grown on SiC substrate by using the non-vacuum ultrasonic spray pyrolysis deposition (USPD) method. The Al2O3 was deposited as gate dielectric and surface passivation simultaneously to effectively suppress gate leakage current, enhance output current density, reduce RF drain current collapse, and improve temperature-dependent stabilities performance. The present MOS-HEMT design has shown improved device performances with respect to a Schottky-gate HEMT, including drain-source saturation current density at zero gate bias (IDSS: 337.6 mA mm-1 → 462.9 mA mm-1), gate-voltage swing (GVS: 1.55 V → 2.92 V), two-terminal gate-drain breakdown voltage (BVGD: -103.8 V → -183.5 V), unity-gain cut-off frequency (fT: 11.3 GHz → 17.7 GHz), maximum oscillation frequency (fmax: 14.2 GHz → 19.1 GHz), and power added effective (P.A.E.: 25.1% → 43.6%). The bias conditions for measuring fT and fmax of the studied MOS-HEMT (Schottky-gate HEMT) are VGS = -2.5 (-2) V and VDS = 7 V. The corresponding VGS and VDS biases are -2.5 (-2) V and 15 V for measuring the P.A.E. characteristic. Moreover, small capacitance-voltage (C-V) hysteresis is obtained in the Al2O3-MOS structure by using USPD. Temperature-dependent characteristics of the present designs at 300-480 K are also studied.

  9. Metamorphosis of the transistor into a laser

    NASA Astrophysics Data System (ADS)

    Feng, M.; Holonyak, N., Jr.

    2015-01-01

    Based on the invention and operation of the transistor, the alloy diode laser, the quantum-well diode laser and the high-speed heterojunction bipolar transistor (HBT), we have invented and realized now a transistor laser (TL). The transistor laser is a three-terminal technology providing coupling and the coherent light emission in the transistor. The quantum-well (QW) heterojunction bipolar transistor laser, inherently a fast switching device, operates by transporting a small minority base charge density ˜1016 \\text{cm}-3 over a nanoscale base thickness (<900 \\text{A}) in picoseconds. The TL, owing to its fast recombination speed, its unique three-terminal configuration, and complementary nature of its optical and electrical collector output signals, enables resonance-free base current and collector voltage modulation. It is a compact source of electro-optical applications such as nonlinear signal mixing, frequency multiplication, negative feedback, and optoelectronics logic gates.

  10. The creation of the magnetic and metallic characteristics in low-width MoS 2 nanoribbon (1D MoS 2): A DFT study

    NASA Astrophysics Data System (ADS)

    Shidpour, Reza; Manteghian, Merhrdad

    2009-06-01

    A basic understanding of the catalytic performance is needed to probe the physical properties that change with a reduction in the catalytic clusters size. It has been shown that the edge of low-width MoS2 nanoribbon has a metallic characteristic, while that of bulk MoS2 has a semi-conductive characteristic. For probing the observations, we constructed the models representing the surface atoms and the edge atoms of the MoS2 nanoribbon. The nanoribbon-like model can also be used to model the edge atoms of the nanocluster MoS2 .Then we calculated the density of states (DOS) of infinitely two-dimensional MoS2 and of the structure corresponding to the edge atoms of the MoS2 nanoribbon-like structure with Wien2K software. The magnetic moment of structures was calculated for identifying the magnetic structure. We found that the bulk MoS2 and infinitely two-dimensional MoS2 are semi-conductive and not magnetic, while the computation model corresponding to MoS2 nanoribbon is metallic. The calculation anticipates that the edges of the MoS2 nanocluster and the low-width MoS2 nanoribbon are strongly magnetic.

  11. Monolayer-by-monolayer stacked pyramid-like MoS2 nanodots on monolayered MoS2 flakes with enhanced photoluminescence.

    PubMed

    Yuan, Cailei; Cao, Yingjie; Luo, Xingfang; Yu, Ting; Huang, Zhenping; Xu, Bo; Yang, Yong; Li, Qinliang; Gu, Gang; Lei, Wen

    2015-11-07

    The precise control of the morphology and crystal shape of MoS2 nanostructures is of particular importance for their application in nanoelectronic and optoelectronic devices. Here, we describe a single step route for the synthesis of monolayer-by-monolayer stacked pyramid-like MoS2 nanodots on monolayered MoS2 flakes using a chemical vapor deposition method. First-principles calculations demonstrated that the bandgap of the pyramid-like MoS2 nanodot is a direct bandgap. Enhanced local photoluminescence emission was observed in the pyramid-like MoS2 nanodot, in comparison with monolayered MoS2 flakes. The findings presented here provide new opportunities to tailor the physical properties of MoS2via morphology-controlled synthesis.

  12. Single-transistor-clocked flip-flop

    DOEpatents

    Zhao, Peiyi; Darwish, Tarek; Bayoumi, Magdy

    2005-08-30

    The invention provides a low power, high performance flip-flop. The flip-flop uses only one clocked transistor. The single clocked transistor is shared by the first and second branches of the device. A pulse generator produces a clock pulse to trigger the flip-flop. In one preferred embodiment the device can be made as a static explicit pulsed flip-flop which employs only two clocked transistors.

  13. Low Power Band to Band Tunnel Transistors

    DTIC Science & Technology

    2010-12-15

    the E-field and tunneling at the source- pocket junction you form a parasitic NPN + transistor and the injection mechanism of carriers into the...hypothesis that the 1000 ° C, 5s anneal split lead to a very wide pocket and the accidental formation of a NPN + transistor , while the 1000 ° C, 1s anneal...Low Power Band to Band Tunnel Transistors Anupama Bowonder Electrical Engineering and Computer Sciences University of California at Berkeley

  14. Coaxial inverted geometry transistor having buried emitter

    NASA Technical Reports Server (NTRS)

    Hruby, R. J.; Cress, S. B.; Dunn, W. R. (Inventor)

    1973-01-01

    The invention relates to an inverted geometry transistor wherein the emitter is buried within the substrate. The transistor can be fabricated as a part of a monolithic integrated circuit and is particularly suited for use in applications where it is desired to employ low actuating voltages. The transistor may employ the same doping levels in the collector and emitter, so these connections can be reversed.

  15. Black phosphorus nonvolatile transistor memory

    NASA Astrophysics Data System (ADS)

    Lee, Dain; Choi, Yongsuk; Hwang, Euyheon; Kang, Moon Sung; Lee, Seungwoo; Cho, Jeong Ho

    2016-04-01

    We demonstrated nanofloating gate transistor memory devices (NFGTMs) using mechanically-exfoliated few-layered black phosphorus (BP) channels and gold nanoparticle (AuNPs) charge trapping layers. The resulting BP-NFGTMs exhibited excellent memory performances, including the five-level data storage, large memory window (58.2 V), stable retention (104 s), and cyclic endurance (1000 cycles).We demonstrated nanofloating gate transistor memory devices (NFGTMs) using mechanically-exfoliated few-layered black phosphorus (BP) channels and gold nanoparticle (AuNPs) charge trapping layers. The resulting BP-NFGTMs exhibited excellent memory performances, including the five-level data storage, large memory window (58.2 V), stable retention (104 s), and cyclic endurance (1000 cycles). Electronic supplementary information (ESI) available. See DOI: 10.1039/c6nr02078j

  16. A controllable water signal transistor.

    PubMed

    Wu, Lili; Zhou, Xiaoyan; Lu, Hangjun; Liang, Qing; Kou, Jianlong; Wu, Fengmin; Fan, Jintu

    2017-03-27

    We performed molecular dynamics simulations to study the regulating ability of water chains confined in a Y-shaped nanochannel. It was shown that a signal at the molecular level could be controlled by two other charge-induced signals when the water chains were confined in a Y-shaped nanochannel, demonstrating promising applications as water signal transistors in nanosignal systems. The mechanism of a water signal transistor is similar to a signal logic device. This remarkable ability to control the water signal is attributed to the strong dipole-ordering of the water chains in the nanochannel. The controllable water signal process of the Y-shaped nanochannel provides opportunities for future application in the design of molecular-scale signal devices.

  17. Complementary junction heterostructure field-effect transistor

    DOEpatents

    Baca, A.G.; Drummond, T.J.; Robertson, P.J.; Zipperian, T.E.

    1995-12-26

    A complimentary pair of compound semiconductor junction heterostructure field-effect transistors and a method for their manufacture are disclosed. The p-channel junction heterostructure field-effect transistor uses a strained layer to split the degeneracy of the valence band for a greatly improved hole mobility and speed. The n-channel device is formed by a compatible process after removing the strained layer. In this manner, both types of transistors may be independently optimized. Ion implantation is used to form the transistor active and isolation regions for both types of complimentary devices. The invention has uses for the development of low power, high-speed digital integrated circuits. 10 figs.

  18. Complementary junction heterostructure field-effect transistor

    DOEpatents

    Baca, Albert G.; Drummond, Timothy J.; Robertson, Perry J.; Zipperian, Thomas E.

    1995-01-01

    A complimentary pair of compound semiconductor junction heterostructure field-effect transistors and a method for their manufacture are disclosed. The p-channel junction heterostructure field-effect transistor uses a strained layer to split the degeneracy of the valence band for a greatly improved hole mobility and speed. The n-channel device is formed by a compatible process after removing the strained layer. In this manner, both types of transistors may be independently optimized. Ion implantation is used to form the transistor active and isolation regions for both types of complimentary devices. The invention has uses for the development of low power, high-speed digital integrated circuits.

  19. High current transistor pulse generator

    SciTech Connect

    Nesterov, V.; Cassel, R.

    1991-05-01

    A solid state pulse generator capable of delivering high current trapezoidally shaped pulses into an inductive load has been developed at SLAC. Energy stored in the capacitor bank of the pulse generator is switched to the load through a pair of Darlington transistors. A combination of diodes and Darlington transistors is used to obtain trapezoidal or triangular shaped current pulses into an inductive load and to recover the remaining energy in the same capacitor bank without reversing capacitor voltage. The transistors work in the switch mode, and the power losses are low. The rack mounted pulse generators presently used at SLAC contain a 660 microfarad storage capacitor bank and can deliver 400 amps at 800 volts into inductive loads up to 3 mH. The pulse generators are used in several different power systems, including pulse to pulse bipolar power supplies and in application with current pulses distributed into different inductive loads. The current amplitude and discharge time are controlled by the central computer system through a specially developed multichannel controller. Several years of operation with the pulse generators have proven their consistent performance and reliability. 8 figs.

  20. MoS2 actuators: reversible mechanical responses of MoS2-polymer nanocomposites to photons

    NASA Astrophysics Data System (ADS)

    Fan, Xiaoming; Khosravi, Farhad; Rahneshin, Vahid; Shanmugam, Mariyappan; Loeian, Masoud; Jasinski, Jacek; Cohn, Robert W.; Terentjev, Eugene; Panchapakesan, Balaji

    2015-07-01

    New molybdenum disulfide (MoS2)-based polymer composites and their reversible mechanical responses to light are presented, suggesting MoS2 as an excellent candidate for energy conversion. Homogeneous mixtures of MoS2/polydimethylsiloxane (PDMS) nanocomposites (0.1-5 wt.%) were prepared and their near infrared (NIR) mechanical responses studied with increasing pre-strains. NIR triggering resulted in an extraordinary change in stress levels of the actuators by ~490 times. Actuation responses of MoS2 polymer composites depended on applied pre-strains. At lower levels of pre-strains (3-9%) the actuators showed reversible expansion while at high levels (15-50%), the actuators exhibited reversible contraction. An opto-mechanical conversion (η)˜0.5-3 MPa W-1 was calculated. The ratio of maximum stress due to photo-actuation (σmax) at 50% strain to the minimum stress due to photo-actuation (σmin) at 3% strain was found to be ˜315-322% for MoS2 actuators (for 0.1 to 5 wt.% additive), greater than single layer graphene (˜188%) and multi-wall nanotube (˜172%) photo-mechanical actuators. Unlike other photomechanical actuators, the MoS2 actuators exhibited strong light-matter interactions and an unambiguous increase in amplitude of photomechanical response with increasing strains. A power law dependence of σmax/σmin on strains with a scaling exponent of β = 0.87-1.32 was observed, suggesting that the origin of photomechanical response is intertwined dynamically with the molecular mechanisms at play in MoS2 actuators.

  1. Large area single crystal (0001) oriented MoS2

    NASA Astrophysics Data System (ADS)

    Laskar, Masihhur R.; Ma, Lu; Kannappan, Santhakumar; Sung Park, Pil; Krishnamoorthy, Sriram; Nath, Digbijoy N.; Lu, Wu; Wu, Yiying; Rajan, Siddharth

    2013-06-01

    Layered metal dichalcogenide materials are a family of semiconductors with a wide range of energy band gaps and properties, the potential for exciting physics and technology applications. However, obtaining high crystal quality thin films over a large area remains a challenge. Here we show that chemical vapor deposition (CVD) can be used to achieve large area single crystal Molybdenum Disulfide (MoS2) thin films. Growth temperature and choice of substrate were found to critically impact the quality of film grown, and high temperature growth on (0001) oriented sapphire yielded highly oriented single crystal MoS2 films. Films grown under optimal conditions were found to be of high structural quality from high-resolution X-ray diffraction, transmission electron microscopy, and Raman measurements, approaching the quality of reference geological MoS2. Photoluminescence and electrical measurements confirmed the growth of optically active MoS2 with a low background carrier concentration, and high mobility. The CVD method reported here for the growth of high quality MoS2 thin films paves the way towards growth of a variety of layered 2D chalcogenide semiconductors and their heterostructures.

  2. Remarkably high mobility ultra-thin-film metal-oxide transistor with strongly overlapped orbitals

    NASA Astrophysics Data System (ADS)

    Wei Shih, Chen; Chin, Albert; Fu Lu, Chun; Fang Su, Wei

    2016-01-01

    High mobility channel thin-film-transistor (TFT) is crucial for both display and future generation integrated circuit. We report a new metal-oxide TFT that has an ultra-thin 4.5 nm SnO2 thickness for both active channel and source-drain regions, very high 147 cm2/Vs field-effect mobility, high ION/IOFF of 2.3 × 107, small 110 mV/dec sub-threshold slope, and a low VD of 2.5 V for low power operation. This mobility is already better than chemical-vapor-deposition grown multi-layers MoS2 TFT. From first principle quantum-mechanical calculation, the high mobility TFT is due to strongly overlapped orbitals.

  3. BIMOS transistor solutions for ESD protection in FD-SOI UTBB CMOS technology

    NASA Astrophysics Data System (ADS)

    Galy, Philippe; Athanasiou, S.; Cristoloveanu, S.

    2016-01-01

    We evaluate the Electro-Static Discharge (ESD) protection capability of BIpolar MOS (BIMOS) transistors integrated in ultrathin silicon film for 28 nm Fully Depleted SOI (FD-SOI) Ultra Thin Body and BOX (UTBB) high-k metal gate technology. Using as a reference our measurements in hybrid bulk-SOI structures, we extend the BIMOS design towards the ultrathin silicon film. Detailed study and pragmatic evaluations are done based on 3D TCAD simulation with standard physical models using Average Current Slope (ACS) method and quasi-static DC stress (Average Voltage Slope AVS method). These preliminary 3D TACD results are very encouraging in terms of ESD protection efficiency in advanced FD-SOI CMOS.

  4. Remarkably high mobility ultra-thin-film metal-oxide transistor with strongly overlapped orbitals

    PubMed Central

    Wei Shih, Chen; Chin, Albert; Fu Lu, Chun; Fang Su, Wei

    2016-01-01

    High mobility channel thin-film-transistor (TFT) is crucial for both display and future generation integrated circuit. We report a new metal-oxide TFT that has an ultra-thin 4.5 nm SnO2 thickness for both active channel and source-drain regions, very high 147 cm2/Vs field-effect mobility, high ION/IOFF of 2.3 × 107, small 110 mV/dec sub-threshold slope, and a low VD of 2.5 V for low power operation. This mobility is already better than chemical-vapor-deposition grown multi-layers MoS2 TFT. From first principle quantum-mechanical calculation, the high mobility TFT is due to strongly overlapped orbitals. PMID:26744240

  5. Effect of switched-bias bakes on the postirradiation electrical response of MOS devices

    SciTech Connect

    Fleetwood, D.M.; Shaneyfelt, M.R.; Riewe, L.C.; Winokur, P.S.

    1993-01-01

    Qualitatively different trends in postirradiation electrical response are observed in MOS devices after very long (up to 2.75-year) switched-bias bakes. A revised defect nomenclature is introduced, and implications for MOS defect models are discussed.

  6. Effect of switched-bias bakes on the postirradiation electrical response of MOS devices

    SciTech Connect

    Fleetwood, D.M.; Shaneyfelt, M.R.; Riewe, L.C.; Winokur, P.S.

    1993-03-01

    Qualitatively different trends in postirradiation electrical response are observed in MOS devices after very long (up to 2.75-year) switched-bias bakes. A revised defect nomenclature is introduced, and implications for MOS defect models are discussed.

  7. Formal Multilevel Hierarchical Verification of Synchronous MOS VLSI Circuits.

    DTIC Science & Technology

    1987-06-01

    or vice versa, or when an unexpected X appears), there is no clue about the source of the bug (i.e., whether it comes from a logic bug, ratio bug...the transistor. A threshold drop device appears in circuit diagrams as a square with an X in it. The resistance depends on three factors: 1. Length and...the gate voltage is between 1.5 volts and 3.5 volts the resistance of the transistor is unknown (denoted X ). A depletion transistor is modelled as a

  8. MoS2 -Based Tactile Sensor for Electronic Skin Applications.

    PubMed

    Park, Minhoon; Park, Yong Ju; Chen, Xiang; Park, Yon-Kyu; Kim, Min-Seok; Ahn, Jong-Hyun

    2016-04-06

    A conformal tactile sensor based on MoS2 and graphene is demonstrated. The MoS2 tactile sensor exhibits excellent sensitivity, high uniformity, and good repeatability in terms of various strains. In addition, the outstanding flexibility enables the MoS2 strain tactile sensor to be realized conformally on a finger tip. The MoS2 -based tactile sensor can be utilized for wearable electronics, such as electronic skin.

  9. Plasmons on the edge of MoS2 nanostructures

    NASA Astrophysics Data System (ADS)

    Andersen, Kirsten; Jacobsen, Karsten W.; Thygesen, Kristian S.

    2014-10-01

    Using ab initio calculations we predict the existence of one-dimensional (1D), atomically confined plasmons at the edges of a zigzag MoS2 nanoribbon. The strongest plasmon originates from a metallic edge state localized on the sulfur dimers decorating the Mo edge of the ribbon. A detailed analysis of the dielectric function reveals that the observed deviations from the ideal 1D plasmon behavior result from single-particle transitions between the metallic edge state and the valence and conduction bands of the MoS2 sheet. The Mo and S edges of the ribbon are clearly distinguishable in calculated spatially resolved electron energy loss spectrum owing to the different plasmonic properties of the two edges. The edge plasmons could potentially be utilized for tuning the photocatalytic activity of MoS2 nanoparticles.

  10. Towards an optimised sputtered MoS2 lubricant film

    NASA Technical Reports Server (NTRS)

    Roberts, E. W.

    1986-01-01

    It is shown that the tribological quality of MoS2 lubricant films formed by magnetron sputtering is determined by the choice of sputtering conditions. By selecting the appropriate conditions, films of extremely high lubricity and endurance (in vacuum), which are well suited to many space applications, are obtained. Such MoS2 films, when applied to precision ball hearings, give rise to the lowest torques (for the given test conditions) yet seen in our laboratory. While a remarkably good performance is obtained in vacuum, tests in air show a marked deterioration in lubricating qualities. It is demonstrated that this is attributable to the adsorption of water vapor on MoS2 surfaces and that the degree of deterioration is related to the partial pressure of water vapor present. Analysis of results indicates that the factors relevant to obtaining optimum films are deposition rate and film composition.

  11. In Situ Synthesis of Carbon Nanotube Hybrids with Alternate MoC and MoS2 to Enhance the Electrochemical Activities of MoS2.

    PubMed

    Li, Xin; Zhang, Jinying; Wang, Rui; Huang, Hongyang; Xie, Chong; Li, Zhihui; Li, Jun; Niu, Chunming

    2015-08-12

    Molybdenum disulfides and carbides are effective catalysts for hydrogenation and hydridesulfurization, where MoS2 nanostructures are also highly promising materials for lithium ion batteries. High surface-to-volume ratio and strong interactions with conducting networks are crucial factors for their activities. A new hybrid structure of multiwalled carbon nanotube (MWCNT) with alternate MoC nanoparticles and MoS2 nanosheets (MoS2 + MoC-MWCNT) has been synthesized by controlled carburization of core-shell MoS2-MWCNT hybrid nanotubes and demonstrated by HRTEM, FFT, XRD, and Raman scattering. The MoS2 nanosheets (∼10 nm) remain tightly connected to MWCNT surfaces with {001} planes in parallel to MWCNT walls and the highly crystallized α-MoC particles (∼10 nm) are adhered to MWCNTs at angles of 60-80° between {111} planes and MWCNT walls. The electrochemical performances of the hybrid structures have been demonstrated as anodes for lithium ion batteries to be significantly increased by breaking MoS2 nanotubes into nanosheets (patches) on MWCNT surfaces, especially at high current rates. The specific capacities of MoS2 + MoC-MWCNT sample with ∼23% MoS2 have been demonstrated to be higher than those of MoS2-MWCNTs containing ∼70% MoS2.

  12. Mos oncogene product associates with kinetochores in mammalian somatic cells and disrupts mitotic progression.

    PubMed Central

    Wang, X M; Yew, N; Peloquin, J G; Vande Woude, G F; Borisy, G G

    1994-01-01

    The mos protooncogene has opposing effects on cell cycle progression. It is required for reinitiation of meiotic maturation and for meiotic progression through metaphase II, yet it is an active component of cytostatic factor. mos is a potent oncogene in fibroblasts, but high levels of expression are lethal. The lethality of mos gene expression in mammalian cells could be a consequence of a blockage induced by its cytostatic factor-related activity, which may appear at high dosage in mitotic cells. We have directly tested whether expression of the Mos protein can block mitosis in mammalian cells by microinjecting a fusion protein between Escherichia coli maltose-binding protein and Xenopus c-Mos into PtK1 epithelial cells and analyzing the cells by video time-lapse and immunofluorescence microscopy. Time-course analyses showed that Mos blocked mitosis by preventing progression to a normal metaphase. Chromosomes frequently failed to attain a bipolar orientation and were found near one pole. Injection of a kinase-deficient mutant Mos had no effect on mitosis, indicating that the blockage of mitotic progression required Mos kinase activity. Antitubulin immunostaining of cells blocked by Mos showed that microtubules were present but that spindle morphology was abnormal. Immunostaining for the Mos fusion protein showed that both wild-type and kinase mutant proteins localized at the kinetochores. Our results suggest that mitotic blockage by Mos may result from an action of the Mos kinase on the kinetochores, thus increasing chromosome instability and preventing normal congression. Images PMID:8078882

  13. Defects Engineered Monolayer MoS2 for Improved Hydrogen Evolution Reaction

    DOE PAGES

    Ye, Gonglan; Gong, Yongji; Lin, Junhao; ...

    2016-01-13

    MoS2 is a promising, low-cost material for electrochemical hydrogen production due to its high activity and stability during the reaction. Our work represents an easy method to increase the hydrogen production in electrochemical reaction of MoS2 via defect engineering, and helps to understand the catalytic properties of MoS2.

  14. Effects of Bio-Mos on growth and survival of channel catfish challenged with Edwardsiella ictaluri

    Technology Transfer Automated Retrieval System (TEKTRAN)

    Research examined the effects of Bio-Mos on growth and disease resistance in channel catfish. Catfish were fed either a Con-Sink (36% crude protein (CP) diet) or Bio-Mos-Sink (36% CP diet with Bio-Mos supplemented at 2 g/kg) sinking pellet for 6 wks. followed by an E. ictaluri challenge. Growth pe...

  15. Thickness-dependent interfacial Coulomb scattering in atomically thin field-effect transistors.

    PubMed

    Li, Song-Lin; Wakabayashi, Katsunori; Xu, Yong; Nakaharai, Shu; Komatsu, Katsuyoshi; Li, Wen-Wu; Lin, Yen-Fu; Aparecido-Ferreira, Alex; Tsukagoshi, Kazuhito

    2013-08-14

    Two-dimensional semiconductors are structurally ideal channel materials for the ultimate atomic electronics after silicon era. A long-standing puzzle is the low carrier mobility (μ) in them as compared with corresponding bulk structures, which constitutes the main hurdle for realizing high-performance devices. To address this issue, we perform a combined experimental and theoretical study on atomically thin MoS2 field effect transistors with varying the number of MoS2 layers (NLs). Experimentally, an intimate μ-NL relation is observed with a 10-fold degradation in μ for extremely thinned monolayer channels. To accurately describe the carrier scattering process and shed light on the origin of the thinning-induced mobility degradation, a generalized Coulomb scattering model is developed with strictly considering device configurative conditions, that is, asymmetric dielectric environments and lopsided carrier distribution. We reveal that the carrier scattering from interfacial Coulomb impurities (e.g., chemical residues, gaseous adsorbates, and surface dangling bonds) is greatly intensified in extremely thinned channels, resulting from shortened interaction distance between impurities and carriers. Such a pronounced factor may surpass lattice phonons and serve as dominant scatterers. This understanding offers new insight into the thickness induced scattering intensity, highlights the critical role of surface quality in electrical transport, and would lead to rational performance improvement strategies for future atomic electronics.

  16. Carbon nanotube electrodes in organic transistors.

    PubMed

    Valitova, Irina; Amato, Michele; Mahvash, Farzaneh; Cantele, Giovanni; Maffucci, Antonio; Santato, Clara; Martel, Richard; Cicoira, Fabio

    2013-06-07

    The scope of this Minireview is to provide an overview of the recent progress on carbon nanotube electrodes applied to organic thin film transistors. After an introduction on the general aspects of the charge injection processes at various electrode-semiconductor interfaces, we discuss the great potential of carbon nanotube electrodes for organic thin film transistors and the recent achievements in the field.

  17. PH Sensitive WO3-Based Microelectrochemical Transistors.

    DTIC Science & Technology

    1986-09-22

    a WO3 target. The cyclic voltammetry of these microelectrodes indicates that WO3 connects individual microelectrodes, since the voltammogram of a...transistor that is sensitive to pH. The cyclic voltammetry is pH-dependent and consistent with pH-dependent transistor characteristics, which indicate that the

  18. Magnetoamplification in a bipolar magnetic junction transistor.

    PubMed

    Rangaraju, N; Peters, J A; Wessels, B W

    2010-09-10

    We have demonstrated the first bipolar magnetic junction transistor using a dilute magnetic semiconductor. For an InMnAs p-n-p transistor magnetoamplification is observed at room temperature. The observed magnetoamplification is attributed to the magnetoresistance of the magnetic semiconductor InMnAs heterojunction. The magnetic field dependence of the transistor characteristics confirm that the magnetoamplification results from the junction magnetoresistance. To describe the experimentally observed transistor characteristics, we propose a modified Ebers-Moll model that includes a series magnetoresistance attributed to spin-selective conduction. The capability of magnetic field control of the amplification in an all-semiconductor transistor at room temperature potentially enables the creation of new computer logic architecture where the spin of the carriers is utilized.

  19. Universal power transistor base drive control unit

    DOEpatents

    Gale, Allan R.; Gritter, David J.

    1988-01-01

    A saturation condition regulator system for a power transistor which achieves the regulation objectives of a Baker clamp but without dumping excess base drive current into the transistor output circuit. The base drive current of the transistor is sensed and used through an active feedback circuit to produce an error signal which modulates the base drive current through a linearly operating FET. The collector base voltage of the power transistor is independently monitored to develop a second error signal which is also used to regulate base drive current. The current-sensitive circuit operates as a limiter. In addition, a fail-safe timing circuit is disclosed which automatically resets to a turn OFF condition in the event the transistor does not turn ON within a predetermined time after the input signal transition.

  20. Universal power transistor base drive control unit

    DOEpatents

    Gale, A.R.; Gritter, D.J.

    1988-06-07

    A saturation condition regulator system for a power transistor is disclosed which achieves the regulation objectives of a Baker clamp but without dumping excess base drive current into the transistor output circuit. The base drive current of the transistor is sensed and used through an active feedback circuit to produce an error signal which modulates the base drive current through a linearly operating FET. The collector base voltage of the power transistor is independently monitored to develop a second error signal which is also used to regulate base drive current. The current-sensitive circuit operates as a limiter. In addition, a fail-safe timing circuit is disclosed which automatically resets to a turn OFF condition in the event the transistor does not turn ON within a predetermined time after the input signal transition. 2 figs.

  1. Improvement of charge-pumping electrically detected magnetic resonance and its application to silicon metal-oxide-semiconductor field-effect transistor

    NASA Astrophysics Data System (ADS)

    Hori, Masahiro; Tsuchiya, Toshiaki; Ono, Yukinori

    2017-01-01

    Charge-pumping electrically detected magnetic resonance (CP EDMR), or EDMR in the CP mode, is improved and applied to a silicon metal-oxide-semiconductor field-effect transistor (MOSFET). Real-time monitoring of the CP process reveals that high-frequency transient currents are an obstacle to signal amplification for EDMR. Therefore, we introduce cutoff circuitry, leading to a detection limit for the number of spins as low as 103 for Si MOS interface defects. With this improved method, we demonstrate that CP EDMR inherits one of the most important features of the CP method: the gate control of the energy window of the detectable interface defects for spectroscopy.

  2. Nanofluidic diode and bipolar transistor.

    PubMed

    Daiguji, Hirofumi; Oka, Yukiko; Shirono, Katsuhiro

    2005-11-01

    Theoretical modeling of ionic distribution and transport in a nanochannel containing a surface charge on its wall, 30 nm high and 5 microm long, suggests that ionic current can be controlled by locally modifying the surface charge density through a gate electrode, even if the electrical double layers are not overlapped. When the surface charge densities at the right and left halves of a channel are the same absolute value but of different signs, this could form the basis of a nanofluidic diode. When the surface charge density at the middle part of a channel is modified, this could form the basis of a nanofluidic bipolar transistor.

  3. Low-frequency noise in MoSe2 field effect transistors

    NASA Astrophysics Data System (ADS)

    Das, Suprem R.; Kwon, Jiseok; Prakash, Abhijith; Delker, Collin J.; Das, Saptarshi; Janes, David B.

    2015-02-01

    One of the important performance metrics of emerging nanoelectronic devices, including low dimensional Field Effect Transistors (FETs), is the magnitude of the low-frequency noise. Atomically thin 2D semiconductor channel materials such as MoX2 (X ≡ S, Se) have shown promising transistor characteristics such as ION/IOFF ratio exceeding 106 and low IOFF, making them attractive as channel materials for next generation nanoelectronic devices. However, MoS2 FETs demonstrated to date exhibit high noise levels under ambient conditions. In this letter, we report at least two orders of magnitude smaller values of Hooge parameter in a back-gated MoSe2 FET (10 atomic layers) with nickel S/D contacts and measured at atmospheric pressure and temperature. The channel dominated regime of noise was extracted from the total noise spectrum and is shown to follow a mobility fluctuation model with 1/f dependence. The low noise in MoSe2 FETs is comparable to other 1D nanoelectronic devices such as carbon nanotube FETs (CNT-FETs) and paves the way for use in future applications in precision sensing and communications.

  4. Vertical Silicon Nanowire Field Effect Transistors with Nanoscale Gate-All-Around

    NASA Astrophysics Data System (ADS)

    Guerfi, Youssouf; Larrieu, Guilhem

    2016-04-01

    Nanowires are considered building blocks for the ultimate scaling of MOS transistors, capable of pushing devices until the most extreme boundaries of miniaturization thanks to their physical and geometrical properties. In particular, nanowires' suitability for forming a gate-all-around (GAA) configuration confers to the device an optimum electrostatic control of the gate over the conduction channel and then a better immunity against the short channel effects (SCE). In this letter, a large-scale process of GAA vertical silicon nanowire (VNW) MOSFETs is presented. A top-down approach is adopted for the realization of VNWs with an optimum reproducibility followed by thin layer engineering at nanoscale. Good overall electrical performances were obtained, with excellent electrostatic behavior (a subthreshold slope (SS) of 95 mV/dec and a drain induced barrier lowering (DIBL) of 25 mV/V) for a 15-nm gate length. Finally, a first demonstration of dual integration of n-type and p-type VNW transistors for the realization of CMOS inverter is proposed.

  5. The 6.5 kV clustered insulated gate bipolar transistor in homogeneous base technology

    NASA Astrophysics Data System (ADS)

    Luther-King, N.; Sweet, M.; Spulber, O.; Vershinin, K.; Ngw, C. K.; Bose, S. C.; De Souza, M. M.; Sankara Narayanan, E. M.

    2001-01-01

    The aim of this paper is to evaluate the performance of a new power semiconductor device called the clustered insulated gate bipolar transistor (CIGBT) in the homogeneous base (HB) technology for high power applications. The CIGBT belongs to a new family of MOS controlled power devices with thyristor mode of operation in the on-state and current saturation characteristics even at high gate biases. The saturation characteristics are achieved through a unique 'self-clamping' phenomenon at a predetermined anode voltage. This inherent feature enables a wide FBSOA and low loss during switching. Our detailed analysis of the CIGBT using a 2-D mixed device-circuit simulation tool indicates that 525 μm of lightly doped silicon is adequate to block 6.5 kV in the HB technology. The thin substrate improves the trade-off between conduction and switching losses even further. With an on-state voltage drop as low as 2 V at 30 A cm -2 and 3.1 V at 100 A cm -2 the device is able to turn off under inductive switching conditions at a 3 kV line voltage, with significantly low energy losses in comparison to an optimised homogeneous base insulated gate bipolar transistor (HB-IGBT). Further, the device shows good short circuit withstand capability and its positive temperature coefficient of the forward voltage drop eases parallel integration.

  6. High-resolution electrohydrodynamic inkjet printing of stretchable metal oxide semiconductor transistors with high performance.

    PubMed

    Kim, S-Y; Kim, K; Hwang, Y H; Park, J; Jang, J; Nam, Y; Kang, Y; Kim, M; Park, H J; Lee, Z; Choi, J; Kim, Y; Jeong, S; Bae, B-S; Park, J-U

    2016-10-06

    As demands for high pixel densities and wearable forms of displays increase, high-resolution printing technologies to achieve high performance transistors beyond current amorphous silicon levels and to allow low-temperature solution processability for plastic substrates have been explored as key processes in emerging flexible electronics. This study describes electrohydrodynamic inkjet (e-jet) technology for direct printing of oxide semiconductor thin film transistors (TFTs) with high resolution (minimum line width: 2 μm) and superb performance, including high mobility (∼230 cm(2) V(-1) s(-1)). Logic operations of the amplifier circuits composed of these e-jet-printed metal oxide semiconductor (MOS) TFTs demonstrate their high performance. Printed In2O TFTs with e-jet printing-assisted high-resolution S/D electrodes were prepared, and the direct printing of passivation layers on these channels enhanced their gate-bias stabilities significantly. Moreover, low process temperatures (<250 °C) enable the use of thin plastic substrates; highly flexible and stretchable TFT arrays have been demonstrated, suggesting promise for next-generation printed electronics.

  7. Inversion channel diamond metal-oxide-semiconductor field-effect transistor with normally off characteristics

    NASA Astrophysics Data System (ADS)

    Matsumoto, Tsubasa; Kato, Hiromitsu; Oyama, Kazuhiro; Makino, Toshiharu; Ogura, Masahiko; Takeuchi, Daisuke; Inokuma, Takao; Tokuda, Norio; Yamasaki, Satoshi

    2016-08-01

    We fabricated inversion channel diamond metal-oxide-semiconductor field-effect transistors (MOSFETs) with normally off characteristics. At present, Si MOSFETs and insulated gate bipolar transistors (IGBTs) with inversion channels are widely used because of their high controllability of electric power and high tolerance. Although a diamond semiconductor is considered to be a material with a strong potential for application in next-generation power devices, diamond MOSFETs with an inversion channel have not yet been reported. We precisely controlled the MOS interface for diamond by wet annealing and fabricated p-channel and planar-type MOSFETs with phosphorus-doped n-type body on diamond (111) substrate. The gate oxide of Al2O3 was deposited onto the n-type diamond body by atomic layer deposition at 300 °C. The drain current was controlled by the negative gate voltage, indicating that an inversion channel with a p-type character was formed at a high-quality n-type diamond body/Al2O3 interface. The maximum drain current density and the field-effect mobility of a diamond MOSFET with a gate electrode length of 5 μm were 1.6 mA/mm and 8.0 cm2/Vs, respectively, at room temperature.

  8. Inversion channel diamond metal-oxide-semiconductor field-effect transistor with normally off characteristics.

    PubMed

    Matsumoto, Tsubasa; Kato, Hiromitsu; Oyama, Kazuhiro; Makino, Toshiharu; Ogura, Masahiko; Takeuchi, Daisuke; Inokuma, Takao; Tokuda, Norio; Yamasaki, Satoshi

    2016-08-22

    We fabricated inversion channel diamond metal-oxide-semiconductor field-effect transistors (MOSFETs) with normally off characteristics. At present, Si MOSFETs and insulated gate bipolar transistors (IGBTs) with inversion channels are widely used because of their high controllability of electric power and high tolerance. Although a diamond semiconductor is considered to be a material with a strong potential for application in next-generation power devices, diamond MOSFETs with an inversion channel have not yet been reported. We precisely controlled the MOS interface for diamond by wet annealing and fabricated p-channel and planar-type MOSFETs with phosphorus-doped n-type body on diamond (111) substrate. The gate oxide of Al2O3 was deposited onto the n-type diamond body by atomic layer deposition at 300 °C. The drain current was controlled by the negative gate voltage, indicating that an inversion channel with a p-type character was formed at a high-quality n-type diamond body/Al2O3 interface. The maximum drain current density and the field-effect mobility of a diamond MOSFET with a gate electrode length of 5 μm were 1.6 mA/mm and 8.0 cm(2)/Vs, respectively, at room temperature.

  9. Inversion channel diamond metal-oxide-semiconductor field-effect transistor with normally off characteristics

    PubMed Central

    Matsumoto, Tsubasa; Kato, Hiromitsu; Oyama, Kazuhiro; Makino, Toshiharu; Ogura, Masahiko; Takeuchi, Daisuke; Inokuma, Takao; Tokuda, Norio; Yamasaki, Satoshi

    2016-01-01

    We fabricated inversion channel diamond metal-oxide-semiconductor field-effect transistors (MOSFETs) with normally off characteristics. At present, Si MOSFETs and insulated gate bipolar transistors (IGBTs) with inversion channels are widely used because of their high controllability of electric power and high tolerance. Although a diamond semiconductor is considered to be a material with a strong potential for application in next-generation power devices, diamond MOSFETs with an inversion channel have not yet been reported. We precisely controlled the MOS interface for diamond by wet annealing and fabricated p-channel and planar-type MOSFETs with phosphorus-doped n-type body on diamond (111) substrate. The gate oxide of Al2O3 was deposited onto the n-type diamond body by atomic layer deposition at 300 °C. The drain current was controlled by the negative gate voltage, indicating that an inversion channel with a p-type character was formed at a high-quality n-type diamond body/Al2O3 interface. The maximum drain current density and the field-effect mobility of a diamond MOSFET with a gate electrode length of 5 μm were 1.6 mA/mm and 8.0 cm2/Vs, respectively, at room temperature. PMID:27545201

  10. Compliant substrate epitaxy: Au on MoS2

    NASA Astrophysics Data System (ADS)

    Zhou, Yuzhi; Kiriya, Daisuke; Haller, E. E.; Ager, Joel W.; Javey, Ali; Chrzan, D. C.

    2016-02-01

    A theory for the epitaxial growth of Au on MoS2 is developed and analyzed. The theory combines continuum linear elasticity theory with density functional theory to analyze epitaxial growth in this system. It is demonstrated that if one accounts for interfacial energies and strains, the presence of misfit dislocations, and the compliance of the MoS2 substrate, the experimentally observed growth orientation is favored despite the fact that it represents a larger elastic mismatch than two competing structures. The stability of the experimentally preferred orientation is attributed to the formation of a large number of strong Au-S bonds, and it is noted that this strong bond may serve as a means to exfoliate and transfer large single layers sheets of MoS2, as well as to engineer strain within single layers of MoS2. The potential for using a van der Waals-bonded layered material as a compliant substrate for applications in 2D electronic devices and epitaxial thin film growth is discussed.

  11. Plasma nanocoating of thiophene onto MoS2 nanotubes

    NASA Astrophysics Data System (ADS)

    Türkaslan, Banu Esencan; Dikmen, Sibel; Öksüz, Lütfi; Öksüz, Aysegul Uygun

    2015-12-01

    MoS2 nanotubes were coated with conductive polymer thiophene by atmospheric pressure radio-frequency (RF) glow discharge. MoS2 nanotubes were prepared by thermal decomposition of hexadecylamine (HDA) intercalated laminar MoS2 precursor on anodized aluminum oxide template and the thiophene was polymerized directly on surface of these nanotubes as in situ by plasma method. The effect of plasma power on PTh/MoS2 nanocomposite properties has been investigated by means of Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM and EDX), and X-ray diffraction spectroscopy (XRD). The presence of PTh bands in the FTIR spectra of PTh/MoS2 nanotube nanocomposites corresponding XRD results indicates that the polythiophene coating onto MoS2 nanotube. The chemical structure of PTh is not changed when the plasma power of discharge differ from 117 to 360 W. SEM images of nanocomposites show that when the discharge power is increased between 117 and 360 W the average diameter of PTh/MoS2 nanotube nanocomposites are changed and the structure become more uniformly.

  12. Photovoltage field-effect transistors

    NASA Astrophysics Data System (ADS)

    Adinolfi, Valerio; Sargent, Edward H.

    2017-02-01

    The detection of infrared radiation enables night vision, health monitoring, optical communications and three-dimensional object recognition. Silicon is widely used in modern electronics, but its electronic bandgap prevents the detection of light at wavelengths longer than about 1,100 nanometres. It is therefore of interest to extend the performance of silicon photodetectors into the infrared spectrum, beyond the bandgap of silicon. Here we demonstrate a photovoltage field-effect transistor that uses silicon for charge transport, but is also sensitive to infrared light owing to the use of a quantum dot light absorber. The photovoltage generated at the interface between the silicon and the quantum dot, combined with the high transconductance provided by the silicon device, leads to high gain (more than 104 electrons per photon at 1,500 nanometres), fast time response (less than 10 microseconds) and a widely tunable spectral response. Our photovoltage field-effect transistor has a responsivity that is five orders of magnitude higher at a wavelength of 1,500 nanometres than that of previous infrared-sensitized silicon detectors. The sensitization is achieved using a room-temperature solution process and does not rely on traditional high-temperature epitaxial growth of semiconductors (such as is used for germanium and III–V semiconductors). Our results show that colloidal quantum dots can be used as an efficient platform for silicon-based infrared detection, competitive with state-of-the-art epitaxial semiconductors.

  13. Graphene field-effect transistors

    NASA Astrophysics Data System (ADS)

    Reddy, Dharmendar; Register, Leonard F.; Carpenter, Gary D.; Banerjee, Sanjay K.

    2011-08-01

    Owing in part to scaling challenges for metal oxide semiconductor field-effect transistors (MOSFETs) and complementary metal oxide semiconductor (CMOS) logic, the semiconductor industry is placing an increased emphasis on emerging materials and devices that may provide improved MOSFET performance beyond the 22 nm node, or provide novel functionality for, e.g. 'beyond CMOS' devices. Graphene, with its novel and electron-hole symmetric band structure and its high carrier mobilities and thermal velocities, is one such material that has garnered a great deal of interest for both purposes. Single and few layer carbon sheets have been fabricated by a variety of techniques including mechanical exfoliation and chemical vapour deposition, and field-effect transistors have been demonstrated with room-temperature mobilities as high as 10 000 cm2 V-1 s-1. But graphene is a gapless semiconductor and gate control of current is challenging, off-state leakage currents are high, and current does not readily saturate with drain voltage. However, various ways to overcome, adapt to, or even embrace this property are now being considered for device applications. In this work we explore through illustrative examples the potential of and challenges to graphene use for conventional and novel device applications.

  14. Engineering the Caenorhabditis elegans genome by Mos1-induced transgene-instructed gene conversion.

    PubMed

    Robert, Valérie J P

    2012-01-01

    Mos1-induced transgene-instructed gene conversion (MosTIC) is a technique of choice to engineer the genome of the nematode Caenorhabditis elegans. MosTIC is initiated by the excision of Mos1, a DNA transposon of the Tc1/Mariner super family that can be mobilized in the germ line of C. elegans. Mos1 excision creates a DNA double-strand break that is repaired by several cellular mechanisms, including transgene-instructed gene conversion. For MosTIC, the transgenic repair template used by the gene conversion machinery is made of sequences that share DNA homologies with the genomic region to engineer and carries the modifications to be introduced in the genome. In this chapter, we present two MosTIC protocols routinely used.

  15. Single step, bulk synthesis of engineered MoS2 quantum dots for multifunctional electrocatalysis

    NASA Astrophysics Data System (ADS)

    Tadi, Kiran Kumar; Palve, Anil M.; Pal, Shubhadeep; Sudeep, P. M.; Narayanan, Tharangattu N.

    2016-07-01

    Bi- or tri- functional catalysts based on atomic layers are receiving tremendous scientific attention due to their importance in various energy technologies. Recent studies on molybdenum disulphide (MoS2) nanosheets revealed that controlling the edge states and doping/modifying with suitable elements are highly important in tuning the catalytic activities of MoS2. Here we report a bulk, single step method to synthesize metal modified MoS2 quantum dots (QDs). Three elements, namely Fe, Mg and Li, are chosen to study the effects of dopants in the catalytic activities of MoS2. Fe and Mg are found to act like dopants in the MoS2 lattice forming respective doped MoS2 QDs, while Li formed an intercalated MoS2 QD. The efficacy and tunability of these luminescent doped QDs towards various electrocatalytic activities (hydrogen evolution reaction, oxygen evolution reaction and oxygen reduction action) are reported here.

  16. Pressure confinement effect in MoS2 monolayers

    NASA Astrophysics Data System (ADS)

    Li, Fangfei; Yan, Yalan; Han, Bo; Li, Liang; Huang, Xiaoli; Yao, Mingguang; Gong, Yuanbo; Jin, Xilian; Liu, Baoli; Zhu, Chuanrui; Zhou, Qiang; Cui, Tian

    2015-05-01

    With ever increasing interest in layered materials, molybdenum disulfide has been widely investigated due to its unique optoelectronic properties. Pressure is an effective technique to tune the lattice and electronic structure of materials such that high pressure studies can disclose new structural and optical phenomena. In this study, taking MoS2 as an example, we investigate the pressure confinement effect on monolayer MoS2 by in situ high pressure Raman and photoluminescence (PL) measurements. Our results reveal a structural deformation of monolayer MoS2 starting from 0.84 GPa, which is evidenced by the splitting of E12g and A1g modes. A further compression leads to a transition from the 1H-MoS2 phase to a novel structure evidenced by the appearance of two new peaks located at 200 and 240 cm-1. This is a distinct feature of monolayer MoS2 compared with bulk MoS2. The new structure is supposed to have a distorted unit with the S atoms slided within a single layer like that of metastable 1T'-MoS2. However, unlike the non-photoluminescent 1T'-MoS2 structure, our monolayer shows a remarkable PL peak and a pressure-induced blue shift up to 13.1 GPa. This pressure-dependent behavior might enable the development of novel devices with multiple phenomena involving the strong coupling of the mechanical, electrical and optical properties of layered nanomaterials.With ever increasing interest in layered materials, molybdenum disulfide has been widely investigated due to its unique optoelectronic properties. Pressure is an effective technique to tune the lattice and electronic structure of materials such that high pressure studies can disclose new structural and optical phenomena. In this study, taking MoS2 as an example, we investigate the pressure confinement effect on monolayer MoS2 by in situ high pressure Raman and photoluminescence (PL) measurements. Our results reveal a structural deformation of monolayer MoS2 starting from 0.84 GPa, which is evidenced by the

  17. Voltage regulator for battery power source. [using a bipolar transistor

    NASA Technical Reports Server (NTRS)

    Black, J. M. (Inventor)

    1979-01-01

    A bipolar transistor in series with the battery as the control element also in series with a zener diode and a resistor is used to maintain a predetermined voltage until the battery voltage decays to very nearly the predetermined voltage. A field effect transistor between the base of the bipolar transistor and a junction between the zener diode and resistor regulates base current of the bipolar transistor, thereby regulating the conductivity of the bipolar transistor for control of the output voltage.

  18. Programmable ion-sensitive transistor interfaces. I. Electrochemical gating

    NASA Astrophysics Data System (ADS)

    Jayant, Krishna; Auluck, Kshitij; Funke, Mary; Anwar, Sharlin; Phelps, Joshua B.; Gordon, Philip H.; Rajwade, Shantanu R.; Kan, Edwin C.

    2013-07-01

    Electrochemical gating is the process by which an electric field normal to the insulator electrolyte interface shifts the surface chemical equilibrium and further affects the charge in solution [Jiang and Stein, LangmuirLANGD50743-746310.1021/la9044682 26, 8161 (2010)]. The surface chemical reactivity and double-layer charging at the interface of electrolyte-oxide-semiconductor (EOS) capacitors is investigated. We find a strong pH-dependent hysteresis upon dc potential cycling. Varying salinity at a constant pH does not change the hysteretic window, implying that field-induced surface pH regulation is the dominant cause of hysteresis. We propose and investigate this mechanism in foundry-made floating-gate ion-sensitive field-effect transistors, which can serve as both an ionic sensor and an actuator. Termed the chemoreceptive neuron metal-oxide-semiconductor (CνMOS) transistor, it features independently driven control gates (CGs) and sensing gates (SGs) that are capacitively coupled to an extended floating gate (FG). The SG is exposed to fluid, the CG is independently driven, and the FG is capable of storing charge QFG of either polarity. Asymmetric capacitive coupling between the CG and SG to FG results in intrinsic amplification of the measured surface potential shifts and influences the FG charge injection mechanism. This modified SG surface condition was monitored through transient recordings of the output current, performed under alternate positive and negative CG pulses. Transient recordings revealed a hysteresis where the current was enhanced under negative pulsing and reduced after positive pulsing. This hysteresis effect is similar to that observed with EOS capacitors, suggesting a field-dependent surface charge regulation mechanism at play. At high CG biases, nonvolatile charge QFG tunneling into the FG occurs, which creates a larger field and tunes the pH response and the point of zero charge. This mechanism gives rise to surface programmability. In

  19. Nucleoporin MOS7/Nup88 is required for mitosis in gametogenesis and seed development in Arabidopsis

    PubMed Central

    Park, Guen Tae; Frost, Jennifer M.; Park, Jin-Sup; Kim, Tae Ho; Lee, Jong Seob; Oh, Sung Aeong; Twell, David; Brooks, Janie Sue; Fischer, Robert L.; Choi, Yeonhee

    2014-01-01

    Angiosperm reproduction is characterized by alternate diploid sporophytic and haploid gametophytic generations. Gametogenesis shares similarities with that of animals except for the formation of the gametophyte, whereby haploid cells undergo several rounds of postmeiotic mitosis to form gametes and the accessory cells required for successful reproduction. The mechanisms regulating gametophyte development in angiosperms are incompletely understood. Here, we show that the nucleoporin Nup88-homolog MOS7 (Modifier of Snc1,7) plays a crucial role in mitosis during both male and female gametophyte formation in Arabidopsis thaliana. Using a mutagenesis screen, we identify the mos7-5 mutant allele, which causes ovule and pollen abortion in MOS7/mos7-5 heterozygous plants, and preglobular stage embryonic lethality in homozygous mos7-5 seeds. During interphase, we show that MOS7 is localized to the nuclear membrane but, like many nucleoporins, is associated with the spindle apparatus during mitosis. We detect interactions between MOS7 and several nucleoporins known to control spindle dynamics, and find that in pollen from MOS7/mos7-5 heterozygotes, abortion is accompanied by a failure of spindle formation, cell fate specification, and phragmoplast activity. Most intriguingly, we show that following gamete formation by MOS7/mos7-5 heterozygous spores, inheritance of either the MOS7 or the mos7-5 allele by a given gamete does not correlate with its respective survival or abortion. Instead, we suggest a model whereby MOS7, which is highly expressed in the Pollen- and Megaspore Mother Cells, enacts a dosage-limiting effect on the gametes to enable their progression through subsequent mitoses. PMID:25489100

  20. Nucleoporin MOS7/Nup88 is required for mitosis in gametogenesis and seed development in Arabidopsis.

    PubMed

    Park, Guen Tae; Frost, Jennifer M; Park, Jin-Sup; Kim, Tae Ho; Lee, Jong Seob; Oh, Sung Aeong; Twell, David; Brooks, Janie Sue; Fischer, Robert L; Choi, Yeonhee

    2014-12-23

    Angiosperm reproduction is characterized by alternate diploid sporophytic and haploid gametophytic generations. Gametogenesis shares similarities with that of animals except for the formation of the gametophyte, whereby haploid cells undergo several rounds of postmeiotic mitosis to form gametes and the accessory cells required for successful reproduction. The mechanisms regulating gametophyte development in angiosperms are incompletely understood. Here, we show that the nucleoporin Nup88-homolog MOS7 (Modifier of Snc1,7) plays a crucial role in mitosis during both male and female gametophyte formation in Arabidopsis thaliana. Using a mutagenesis screen, we identify the mos7-5 mutant allele, which causes ovule and pollen abortion in MOS7/mos7-5 heterozygous plants, and preglobular stage embryonic lethality in homozygous mos7-5 seeds. During interphase, we show that MOS7 is localized to the nuclear membrane but, like many nucleoporins, is associated with the spindle apparatus during mitosis. We detect interactions between MOS7 and several nucleoporins known to control spindle dynamics, and find that in pollen from MOS7/mos7-5 heterozygotes, abortion is accompanied by a failure of spindle formation, cell fate specification, and phragmoplast activity. Most intriguingly, we show that following gamete formation by MOS7/mos7-5 heterozygous spores, inheritance of either the MOS7 or the mos7-5 allele by a given gamete does not correlate with its respective survival or abortion. Instead, we suggest a model whereby MOS7, which is highly expressed in the Pollen- and Megaspore Mother Cells, enacts a dosage-limiting effect on the gametes to enable their progression through subsequent mitoses.

  1. Advanced heterostructure transistor technologies for wireless communications

    NASA Astrophysics Data System (ADS)

    Wang, N.-L. Larry; Lin, Barry; Chau, Frank H.-F.; Jackson, Gordon; Chen, Zhengming; Lee, C. P.

    1999-08-01

    Wireless communication has enjoyed tremendous growth in the last five years. Most of the market is below the 3 GHz. Recently, millimeter wave frequency band was also opened up to commercial applications, such as the Local Multipoint Distribution System. The rapid growth of the market demands cost effective RF circuitry with ever better performance. Thus, the heterostructure transistors are pursued to meeting the market needs. This article will first analyze the technical demand on RF transistor circuitry for wireless application. Existing and emerging transistor technologies will be discussed for its strength. A general comparison will be made.

  2. Transistors using crystalline silicon devices on glass

    DOEpatents

    McCarthy, Anthony M.

    1995-01-01

    A method for fabricating transistors using single-crystal silicon devices on glass. This method overcomes the potential damage that may be caused to the device during high voltage bonding and employs a metal layer which may be incorporated as part of the transistor. This is accomplished such that when the bonding of the silicon wafer or substrate to the glass substrate is performed, the voltage and current pass through areas where transistors will not be fabricated. After removal of the silicon substrate, further metal may be deposited to form electrical contact or add functionality to the devices. By this method both single and gate-all-around devices may be formed.

  3. Pass-transistor very large scale integration

    NASA Technical Reports Server (NTRS)

    Maki, Gary K. (Inventor); Bhatia, Prakash R. (Inventor)

    2004-01-01

    Logic elements are provided that permit reductions in layout size and avoidance of hazards. Such logic elements may be included in libraries of logic cells. A logical function to be implemented by the logic element is decomposed about logical variables to identify factors corresponding to combinations of the logical variables and their complements. A pass transistor network is provided for implementing the pass network function in accordance with this decomposition. The pass transistor network includes ordered arrangements of pass transistors that correspond to the combinations of variables and complements resulting from the logical decomposition. The logic elements may act as selection circuits and be integrated with memory and buffer elements.

  4. Radiation response of SNOS nonvolatile transistors

    NASA Astrophysics Data System (ADS)

    McWhorter, P. J.; Miller, S. L.; Dellin, T. A.

    1986-12-01

    Data loss and permanent damage resulting from the irradiation of SNOS (polySilicon-Nitride-Oxide-Silicon) nonvolatile memory transistors fabricated with current SNLA EEPROM processing are examined. It is shown that these transistors can retain data for ten years after a 500 krad irradiation, and can be programmed and function properly following a 1300 Mrad irradiation. A new model is presented which yields a simple analytical solution that accurately predicts the radiation induced threshold voltage shifts of SNOS transistors for a wide range of initial threshold voltages and total doses.

  5. Radiation response of SNOS nonvolatile transistors

    SciTech Connect

    McWhorter, P.J.; Miller, S.L.; Dellin, T.A.

    1986-01-01

    Data loss and permanent damage resulting from the irradiation of SNOS (polySilicon-Nitride-Oxide-Silicon) nonvolatile memory transistors fabricated with current SNLA EEPROM processing are examined. It is shown that these transistors can retain data for ten years after a 500 krad irradiation, and can be programmed and function properly following a 1300 Mrad irradiation. A new model is presented which yields a simple analytical solution that accurately predicts the radiation induced threshold voltage shifts of SNOS transistors for a wide range of initial threshold voltages and total doses. 10 refs.

  6. Alternative materials for next-generation transistors: High-k/germanium-based MOSFET

    NASA Astrophysics Data System (ADS)

    Hsueh, Chein-Lan

    Electronic devices that make up 99% of the computer processor and memory market are based on silicon (semiconductor) and silicon dioxide (insulator) technology. Unfortunately the key transistor gate stack structure within the "traditional" technology has reached an intrinsic physical scaling limit; the ultrathin gate oxide, already at 1nm thickness, cannot be made thinner without resulting in an intolerably high leakage current and reduced drive current. This limitation can be avoided by replacing the thin gate dielectric with a thicker film of an alternative material with a permittivity higher than that of SiO2, an accomplishing that has been realized in production just as this thesis goes to press. To further increase device performance, replacing the Si semiconductor with germanium as an alternative channel material is an attractive option for its high mobility and narrow band gap. However, the lack of a stable insulating oxide with high quality electrical properties prevents the fabrication of competitive Ge-based metal oxide semiconductor field effect transistors (MOSFETs). This dissertation reports the study of potential future-generation transistors with high-k dielectrics (HfO2 and Al2O3) on Ge substrates. A brief review of current research and development is first given followed by an introduction of the thin film characterization techniques used in this work. Various cleaning treatments as well as surface passivation methods using wet chemistry have been investigated on Ge substrates. Next, thin high-k dielectric films of HfO2 and Al2O3 have been deposited on Ge using atomic layer deposition (ALD). ALD permits films to be grown with monolayer control and excellent film conformality. Physical, chemical and electrical characterization has been performed on the multilayer film structures. Optimization of the film growth has been developed and we have demonstrated high quality with Au/HfO2/Ge nMOS devices. Capacitance-voltage electrical measurements show that

  7. Integration of Highly Strained SiGe in Source and Drain with HK and MG for 22 nm Bulk PMOS Transistors

    NASA Astrophysics Data System (ADS)

    Wang, Guilei; Luo, Jun; Qin, Changliang; Liang, Renrong; Xu, Yefeng; Liu, Jinbiao; Li, Junfeng; Yin, Huaxiang; Yan, Jiang; Zhu, Huilong; Xu, Jun; Zhao, Chao; Radamson, Henry H.; Ye, Tianchun

    2017-02-01

    In this study, the integration of SiGe selective epitaxy on source/drain regions and high-k and metal gate for 22 nm node bulk pMOS transistors has been presented. Selective Si1- x Ge x growth (0.35 ≤ × ≤ 0.40) with boron concentration of 1-3 × 1020 cm-3 was used to elevate the source/drain. The main focus was optimization of the growth parameters to improve the epitaxial quality where the high-resolution x-ray diffraction (HRXRD) and energy dispersive spectrometer (EDS) measurement data provided the key information about Ge profile in the transistor structure. The induced strain by SiGe layers was directly measured by x-ray on the array of transistors. In these measurements, the boron concentration was determined from the strain compensation of intrinsic and boron-doped SiGe layers. Finally, the characteristic of transistors were measured and discussed showing good device performance.

  8. Nonvolatile Ferroelectric Memory Circuit Using Black Phosphorus Nanosheet-Based Field-Effect Transistors with P(VDF-TrFE) Polymer.

    PubMed

    Lee, Young Tack; Kwon, Hyeokjae; Kim, Jin Sung; Kim, Hong-Hee; Lee, Yun Jae; Lim, Jung Ah; Song, Yong-Won; Yi, Yeonjin; Choi, Won-Kook; Hwang, Do Kyung; Im, Seongil

    2015-10-27

    Two-dimensional van der Waals (2D vdWs) materials are a class of new materials that can provide important resources for future electronics and materials sciences due to their unique physical properties. Among 2D vdWs materials, black phosphorus (BP) has exhibited significant potential for use in electronic and optoelectronic applications because of its allotropic properties, high mobility, and direct and narrow band gap. Here, we demonstrate a few-layered BP-based nonvolatile memory transistor with a poly(vinylidenefluoride-trifluoroethylene) (P(VDF-TrFE)) ferroelectric top gate insulator. Experiments showed that our BP-based ferroelectric transistors operate satisfactorily at room temperature in ambient air and exhibit a clear memory window. Unlike conventional ambipolar BP transistors, our ferroelectric transistors showed only p-type characteristics due to the carbon-fluorine (C-F) dipole effect of the P(VDF-TrFE) layer, as well as the highest linear mobility value of 1159 cm(2) V(-1) s(-1) with a 10(3) on/off current ratio. For more advanced memory applications beyond unit memory devices, we implemented two memory inverter circuits, a resistive-load inverter circuit and a complementary inverter circuit, combined with an n-type molybdenum disulfide (MoS2) nanosheet. Our memory inverter circuits displayed a clear memory window of 15 V and memory output voltage efficiency of 95%.

  9. Integration of Highly Strained SiGe in Source and Drain with HK and MG for 22 nm Bulk PMOS Transistors.

    PubMed

    Wang, Guilei; Luo, Jun; Qin, Changliang; Liang, Renrong; Xu, Yefeng; Liu, Jinbiao; Li, Junfeng; Yin, Huaxiang; Yan, Jiang; Zhu, Huilong; Xu, Jun; Zhao, Chao; Radamson, Henry H; Ye, Tianchun

    2017-12-01

    In this study, the integration of SiGe selective epitaxy on source/drain regions and high-k and metal gate for 22 nm node bulk pMOS transistors has been presented. Selective Si1-x Ge x growth (0.35 ≤ × ≤ 0.40) with boron concentration of 1-3 × 10(20) cm(-3) was used to elevate the source/drain. The main focus was optimization of the growth parameters to improve the epitaxial quality where the high-resolution x-ray diffraction (HRXRD) and energy dispersive spectrometer (EDS) measurement data provided the key information about Ge profile in the transistor structure. The induced strain by SiGe layers was directly measured by x-ray on the array of transistors. In these measurements, the boron concentration was determined from the strain compensation of intrinsic and boron-doped SiGe layers. Finally, the characteristic of transistors were measured and discussed showing good device performance.

  10. Dual role of monolayer MoS2 in enhanced photocatalytic performance of hybrid MoS2/SnO2 nanocomposite

    NASA Astrophysics Data System (ADS)

    Ding, Shuang-Shuang; Huang, Wei-Qing; Yang, Yin-Cai; Zhou, Bing-Xin; Hu, Wang-Yu; Long, Meng-Qiu; Peng, P.; Huang, Gui-Fang

    2016-05-01

    The enhanced photocatalytic performance of various MoS2-based nanomaterials has recently been observed, but the role of monolayer MoS2 is still not well elucidated at the electronic level. Herein, focusing on a model system, hybrid MoS2/SnO2 nanocomposite, we first present a theoretical elucidation of the dual role of monolayer MoS2 as a sensitizer and a co-catalyst by performing density functional theory calculations. It is demonstrated that a type-II, staggered, band alignment of ˜0.49 eV exists between monolayer MoS2 and SnO2 with the latter possessing the higher electron affinity, or work function, leading to the robust separation of photoexcited charge carriers between the two constituents. Under irradiation, the electrons are excited from Mo 4d orbitals to SnO2, thus enhancing the reduction activity of latter, indicating that the monolayer MoS2 is an effective sensitizer. Moreover, the Mo atoms, which are catalytically inert in isolated monolayer MoS2, turn into catalytic active sites, making the monolayer MoS2 to be a highly active co-catalyst in the composite. The dual role of monolayer MoS2 is expected to arise in other MoS2-semiconductor nanocomposites. The calculated absorption spectra can be rationalized by available experimental results. These findings provide theoretical evidence supporting the experimental reports and pave the way for developing highly efficient MoS2-based photocatalysts.

  11. Comparing the Ocean Color Measurements Between MOS and SeaWiFS: A Vicarious Intercalibration Approach for MOS

    NASA Technical Reports Server (NTRS)

    Wang, Menghua; Franz, Bryan A.

    1998-01-01

    One of the primary goals of the NASA Sensor Intercomparison and Merger for Biological and Interdisciplinary Oceanic Studies (SIMBIOS) project is to develop methods for meaningful comparison and possible merging of data products from multiple ocean color missions. The Modular Optoelectronic Scanner (MOS) is a German instrument that was launched in the spring of 1996 on the Indian IRS-P3 satellite. With the successful launch of NASA's Sea-viewing Wide Field-of-view Sensor (SeaWiFS) in the summer of 1997, there are now two ocean color missions in concurrent operation and there is interest within the scientific community to compare data from these two sensors. In this paper, we describe our efforts to retrieve ocean optical properties from both SeaWiFS and MOS using consistent methods. We first briefly review the atmospheric correction, which removes more than 90% of the observed radiances in the visible, and then describe how the atmospheric correction algorithm used for the SeaWiFS data can be modified for application to other ocean color sensors. Next, since the retrieved water-leaving radiances in the visible between MOS and SeaWiFS are significantly different, we developed a vicarious intercalibration method to recalibrate the MOS spectral bands based on the optical properties of the ocean and atmosphere derived from the coincident SeaWiFS measurements. We present and discuss the MOS retrieved ocean optical properties before and after the vicarious calibration, and demonstrate the efficacy of this approach. We show that it is possible and efficient to vicariously intercalibrate sensors between one and another.

  12. High-performance enhancement-mode AlGaN/GaN MOS-HEMTs with fluorinated stack gate dielectrics and thin barrier layer

    NASA Astrophysics Data System (ADS)

    Tao, Gao; Ruimin, Xu; Kai, Zhang; Yuechan, Kong; Jianjun, Zhou; Cen, Kong; Xinxin, Yu; Xun, Dong; Tangsheng, Chen

    2016-06-01

    We present high-performance enhancement-mode AlGaN/GaN metal—oxide—semiconductor high-electron mobility transistors (MOS-HEMTs) by a fluorinated gate dielectric technique. A nanolaminate of an Al2O3/La x Al1-x O 3/Al2O3 stack (x≈0.33) grown by atomic layer deposition is employed to avoid fluorine ions implantation into the scaled barrier layer. Fabricated enhancement-mode MOS-HEMTs exhibit an excellent performance as compared to those with the conventional dielectric-last technique, delivering a large maximum drain current of 916 mA/mm and simultaneously a high peak transconductance of 342 mS/mm. The balanced DC characteristics indicate that advanced gate stack dielectrics combined with buffered fluorine ions implantation have a great potential for high speed GaN E/D-mode integrated circuit applications. Project supported by the National Natural Science Foundation of China (Nos. 61504125, 61474101, 61106130 61076120, 61505181), and the Natural Science Foundation of Jiangsu Province of China (Nos. BK20131072, BE2012007, BK2012516).

  13. Physical understanding of trends in current collapse with atomic layer deposited dielectrics in AlGaN/GaN MOS heterojunction FETs

    NASA Astrophysics Data System (ADS)

    Ramanan, Narayanan; Lee, Bongmook; Misra, Veena

    2016-03-01

    Many passivation dielectrics are pursued for suppressing current collapse due to trapping/detrapping of access-region surface traps in AlGaN/GaN based metal oxide semiconductor heterojuction field effect transistors (MOS-HFETs). The suppression of current collapse can potentially be achieved either by reducing the interaction of surface traps with the gate via surface leakage current reduction, or by eliminating surface traps that can interact with the gate. But, the latter is undesirable since a high density of surface donor traps is required to sustain a high 2D electron gas density at the AlGaN/GaN heterointerface and provide a low ON-resistance. This presents a practical trade-off wherein a passivation dielectric with the optimal surface trap characteristics and minimal surface leakage is to be chosen. In this work, we compare MOS-HFETs fabricated with popular ALD gate/passivation dielectrics like SiO2, Al2O3, HfO2 and HfAlO along with an additional thick plasma-enhanced chemical vapor deposition SiO2 passivation. It is found that after annealing in N2 at 700 °C, the stack containing ALD HfAlO provides a combination of low surface leakage and a high density of shallow donor traps. Physics-based TCAD simulations confirm that this combination of properties helps quick de-trapping and minimal current collapse along with a low ON resistance.

  14. High performance light emitting transistors

    NASA Astrophysics Data System (ADS)

    Namdas, Ebinazar B.; Ledochowitsch, Peter; Yuen, Jonathan D.; Moses, Daniel; Heeger, Alan J.

    2008-05-01

    Solution processed light emitting field-effect transistors (LEFETs) with peak brightness exceeding 2500cd/m2 and external quantum efficiency of 0.15% are demonstrated. The devices utilized a bilayer film comprising a hole transporting polymer, poly(2,5-bis(3-tetradecylthiophen-2-yl)thieno[3,2-b] thiophene) and a light emitting polymer, Super Yellow, a polyphenylenevinylene derivative. The LEFETs were fabricated in the bottom gate architecture with top-contact Ca /Ag as source/drain electrodes. Light emission was controlled by the gate voltage which controls the hole current. These results indicate that high brightness LEFETs can be made by using the bilayer film (hole transporting layer and a light emitting polymer).

  15. Ionic thermoelectric gating organic transistors

    PubMed Central

    Zhao, Dan; Fabiano, Simone; Berggren, Magnus; Crispin, Xavier

    2017-01-01

    Temperature is one of the most important environmental stimuli to record and amplify. While traditional thermoelectric materials are attractive for temperature/heat flow sensing applications, their sensitivity is limited by their low Seebeck coefficient (∼100 μV K−1). Here we take advantage of the large ionic thermoelectric Seebeck coefficient found in polymer electrolytes (∼10,000 μV K−1) to introduce the concept of ionic thermoelectric gating a low-voltage organic transistor. The temperature sensing amplification of such ionic thermoelectric-gated devices is thousands of times superior to that of a single thermoelectric leg in traditional thermopiles. This suggests that ionic thermoelectric sensors offer a way to go beyond the limitations of traditional thermopiles and pyroelectric detectors. These findings pave the way for new infrared-gated electronic circuits with potential applications in photonics, thermography and electronic-skins. PMID:28139738

  16. Ionic thermoelectric gating organic transistors

    NASA Astrophysics Data System (ADS)

    Zhao, Dan; Fabiano, Simone; Berggren, Magnus; Crispin, Xavier

    2017-01-01

    Temperature is one of the most important environmental stimuli to record and amplify. While traditional thermoelectric materials are attractive for temperature/heat flow sensing applications, their sensitivity is limited by their low Seebeck coefficient (~100 μV K-1). Here we take advantage of the large ionic thermoelectric Seebeck coefficient found in polymer electrolytes (~10,000 μV K-1) to introduce the concept of ionic thermoelectric gating a low-voltage organic transistor. The temperature sensing amplification of such ionic thermoelectric-gated devices is thousands of times superior to that of a single thermoelectric leg in traditional thermopiles. This suggests that ionic thermoelectric sensors offer a way to go beyond the limitations of traditional thermopiles and pyroelectric detectors. These findings pave the way for new infrared-gated electronic circuits with potential applications in photonics, thermography and electronic-skins.

  17. Simple, one transistor circuit boosts pulse amplitude

    NASA Technical Reports Server (NTRS)

    Keon, T.; Matchett, M. W.

    1966-01-01

    Simple circuit that uses a single transistor to accomplish capacitor storage followed by common-base switching supplies a pulse voltage, higher than that normally available from emitter-follower circuits, to drive a 100-watt transmitter.

  18. Liquid crystals for organic transistors (Conference Presentation)

    NASA Astrophysics Data System (ADS)

    Hanna, Jun-ichi; Iino, Hiroaki

    2016-09-01

    Liquid crystals are a new type of organic semiconductors exhibiting molecular orientation in self-organizing manner, and have high potential for device applications. In fact, various device applications have been proposed so far, including photosensors, solar cells, light emitting diodes, field effect transistors, and so on.. However, device performance in those fabricated with liquid crystals is less than those of devices fabricated with conventional materials in spite of unique features of liquid crystals. Here we discuss how we can utilize the liquid crystallinity in organic transistors and how we can overcome conventional non-liquid crystalline organic transistor materials. Then, we demonstrate high performance organic transistors fabricated with a smectic E liquid crystal of Ph-BTBT-10, which show high mobility of over 10cm2/Vs and high thermal durability of over 200oC in OFETs fabricated with its spin-coated polycrystalline thin films.

  19. Logic gates based on ion transistors.

    PubMed

    Tybrandt, Klas; Forchheimer, Robert; Berggren, Magnus

    2012-05-29

    Precise control over processing, transport and delivery of ionic and molecular signals is of great importance in numerous fields of life sciences. Integrated circuits based on ion transistors would be one approach to route and dispense complex chemical signal patterns to achieve such control. To date several types of ion transistors have been reported; however, only individual devices have so far been presented and most of them are not functional at physiological salt concentrations. Here we report integrated chemical logic gates based on ion bipolar junction transistors. Inverters and NAND gates of both npn type and complementary type are demonstrated. We find that complementary ion gates have higher gain and lower power consumption, as compared with the single transistor-type gates, which imitates the advantages of complementary logics found in conventional electronics. Ion inverters and NAND gates lay the groundwork for further development of solid-state chemical delivery circuits.

  20. Ultra-stable oscillator with complementary transistors

    NASA Technical Reports Server (NTRS)

    Kleinberg, L. L. (Inventor)

    1974-01-01

    A high frequency oscillator, having both good short and long term stability, is formed by including a piezoelectric crystal in the base circuit of a first bi-polar transistor circuit, the bi-polar transistor itself operated below its transitional frequency and having its emitter load chosen so that the input impedance, looking into the base thereof, exhibits a negative resistance in parallel with a capacitive reactance. Combined with this basic circuit is an auxiliary, complementary, second bi-polar transistor circuit of the same form with the piezoelectric crystal being common to both circuits. By this configuration small changes in quiescent current are substantially cancelled by opposite variations in the second bi-polar transistor circuit, thereby achieving from the oscillator a signal having its frequency of oscillation stable over long time periods as well as short time periods.

  1. Water-gel for gating graphene transistors.

    PubMed

    Kim, Beom Joon; Um, Soong Ho; Song, Woo Chul; Kim, Yong Ho; Kang, Moon Sung; Cho, Jeong Ho

    2014-05-14

    Water, the primary electrolyte in biology, attracts significant interest as an electrolyte-type dielectric material for transistors compatible with biological systems. Unfortunately, the fluidic nature and low ionic conductivity of water prevents its practical usage in such applications. Here, we describe the development of a solid state, megahertz-operating, water-based gate dielectric system for operating graphene transistors. The new electrolyte systems were prepared by dissolving metal-substituted DNA polyelectrolytes into water. The addition of these biocompatible polyelectrolytes induced hydrogelation to provide solid-state integrity to the system. They also enhanced the ionic conductivities of the electrolytes, which in turn led to the quick formation of an electric double layer at the graphene/electrolyte interface that is beneficial for modulating currents in graphene transistors at high frequencies. At the optimized conditions, the Na-DNA water-gel-gated flexible transistors and inverters were operated at frequencies above 1 MHz and 100 kHz, respectively.

  2. Enhanced second harmonic generation of MoS2 layers on a thin gold film.

    PubMed

    Zeng, Jianhua; Yuan, Maohui; Yuan, Weiguang; Dai, Qiaofeng; Fan, Haihua; Lan, Sheng; Tie, Shaolong

    2015-08-28

    The linear and nonlinear optical properties of thin MoS2 layers exfoliated on an Au/SiO2 substrate were investigated both numerically and experimentally. It was found that the MoS2 layers with different thicknesses exhibited different colors on the gold film. The reflection spectra of the MoS2 layers with different thicknesses were calculated by using the finite-difference time-domain technique and the corresponding chromaticity coordinates were derived. The electric field enhancement factors at both the fundamental light and the second harmonic were calculated and the enhancement factors for second harmonic generation (SHG) were estimated for the MoS2 layers with different thicknesses. Different from the MoS2 layers on a SiO2/Si substrate where the maximum SHG was observed in the single-layer MoS2, the maximum SHG was achieved in the 17 nm-thick MoS2 layer on the Au/SiO2 substrate. As compared with the MoS2 layers on the SiO2/Si substrate, a significant enhancement in SHG was found for the MoS2 layers on the Au/SiO2 substrate due to the strong localization of the electric field. More interestingly, it was demonstrated experimentally that optical data storage can be realized by modifying the SHG intensity of a MoS2 layer through thinning its thickness.

  3. Refined Transistor Model For Simulation Of SEU

    NASA Technical Reports Server (NTRS)

    Zoutendyk, John A.; Benumof, Reuben

    1988-01-01

    Equivalent base resistance added. Theoretical study develops equations for parameters of Gummel-Poon model of bipolar junction transistor: includes saturation current, amplification factors, charging times, knee currents, capacitances, and resistances. Portion of study concerned with base region goes beyond Gummel-Poon analysis to provide more complete understanding of transistor behavior. Extended theory useful in simulation of single-event upset (SEU) caused in logic circuits by cosmic rays or other ionizing radiation.

  4. Bipolar transistor in VESTIC technology: prototype

    NASA Astrophysics Data System (ADS)

    Mierzwiński, Piotr; Kuźmicz, Wiesław; Domański, Krzysztof; Tomaszewski, Daniel; Głuszko, Grzegorz

    2016-12-01

    VESTIC technology is an alternative for traditional CMOS technology. This paper presents first measurement data of prototypes of VES-BJT: bipolar transistors in VESTIC technology. The VES-BJT is a bipolar transistor on the SOI substrate with symmetric lateral structure and both emitter and collector made of polysilicon. The results indicate that VES-BJT can be a device with useful characteristics. Therefore, VESTIC technology has the potential to become a new BiCMOS-type technology with some unique properties.

  5. Floating gate transistors as biosensors (Conference Presentation)

    NASA Astrophysics Data System (ADS)

    Frisbie, C. Daniel

    2016-11-01

    Electrolyte gated transistors (EGTs) are a sub-class of thin film transistors that are extremely promising for biological sensing applications. These devices employ a solid electrolyte as the gate insulator; the very large capacitance of the electrolyte results in low voltage operation and high transconductance or gain. This talk will describe the fabrication of floating gate EGTs and their use as ricin sensors. The critical performance metrics for EGTs compared with other types of TFTs will also be reviewed.

  6. Shaping Transistor Leads for Better Solder Joints

    NASA Technical Reports Server (NTRS)

    Mandel, H.; Dillon, J. D.

    1982-01-01

    Special lead-forming tool puts step in leads of microwave power transistors without damaging braze joints that fasten leads to package. Stepped leads are soldered to circuit boards more reliably than straight leads, and stress on brazes is relieved. Lead-forming hand-tool has two parts: a forming die and an actuator. Spring-loaded saddle is adjusted so that when transistor package is placed on it, leads rest on forming rails.

  7. Enhanced two dimensional electron gas transport characteristics in Al{sub 2}O{sub 3}/AlInN/GaN metal-oxide-semiconductor high-electron-mobility transistors on Si substrate

    SciTech Connect

    Freedsman, J. J. Watanabe, A.; Urayama, Y.; Egawa, T.

    2015-09-07

    The authors report on Al{sub 2}O{sub 3}/Al{sub 0.85}In{sub 0.15}N/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistor (MOS-HEMT) on Si fabricated by using atomic layer deposited Al{sub 2}O{sub 3} as gate insulator and passivation layer. The MOS-HEMT with the gate length of 2 μm exhibits excellent direct-current (dc) characteristics with a drain current maximum of 1270 mA/mm at a gate bias of 3 V and an off-state breakdown voltage of 180 V for a gate-drain spacing of 4 μm. Also, the 1 μm-gate MOS-HEMT shows good radio-frequency (rf) response such as current gain and maximum oscillation cut-off frequencies of 10 and 34 GHz, respectively. The capacitance-voltage characteristics at 1 MHz revealed significant increase in two-dimensional electron gas (2DEG) density for the MOS-HEMT compared to conventional Schottky barrier HEMTs. Analyses using drain-source conductivity measurements showed improvements in 2DEG transport characteristics for the MOS-HEMT. The enhancements in dc and rf performances of the Al{sub 2}O{sub 3}/Al{sub 0.85}In{sub 0.15}N/GaN MOS-HEMT are attributed to the improvements in 2DEG characteristics.

  8. MoS2 Heterojunctions by Thickness Modulation

    DOE PAGES

    Tosun, Mahmut; Fu, Deyi; Desai, Sujay B.; ...

    2015-06-30

    In this work, we report lateral heterojunction formation in as-exfoliated MoS2 flakes by thickness modulation. Kelvin probe force microscopy is used to map the surface potential at the monolayer-multilayer heterojunction, and consequently the conduction band offset is extracted. Scanning photocurrent microscopy is performed to investigate the spatial photocurrent response along the length of the device including the source and the drain contacts as well as the monolayer-multilayer junction. The peak photocurrent is measured at the monolayer-multilayer interface, which is attributed to the formation of a type-I heterojunction. Finally, the work presents experimental and theoretical understanding of the band alignment andmore » photoresponse of thickness modulated MoS2 junctions with important implications for exploring novel optoelectronic devices.« less

  9. Further study of inversion layer MOS solar cells

    NASA Technical Reports Server (NTRS)

    Ho, Fat Duen

    1987-01-01

    A group of inversion layer MOS solar cells has been fabricated. The highest value of open-circuit voltage obtained for the cells is 0.568V. One of the cells has produced a short-circuit current of 79.6 mA and an open-circuit voltage of 0.54V. It is estimated that the actual area AMO efficiency of this cell is 6.6 percent with an assumed value of 0.75 for its fill factor. Efforts made for fabricating an IL/MOS cell with reasonable efficiencies are reported. Future work for 4 sq cm IL cells and 25 sq cm IL cells is discussed.

  10. Excitonic Stark effect in MoS2 monolayers

    NASA Astrophysics Data System (ADS)

    Scharf, Benedikt; Frank, Tobias; Gmitra, Martin; Fabian, Jaroslav; Žutić, Igor; Perebeinos, Vasili

    2016-12-01

    We theoretically investigate excitons in MoS2 monolayers in an applied in-plane electric field. Tight-binding and Bethe-Salpeter equation calculations predict a quadratic Stark shift, of the order of a few meV for fields of 10 V/μ m , in the linear absorption spectra. The spectral weight of the main exciton peaks decreases by a few percent with an increasing electric field due to the exciton field ionization into free carriers as reflected in the exciton wave functions. Subpicosecond exciton decay lifetimes at fields of a few tens of V/μ m could be utilized in solar energy harvesting and photodetection. We find simple scaling relations of the exciton binding, radius, and oscillator strength with the dielectric environment and an electric field, which provides a path to engineering the MoS2 electro-optical response.

  11. Microwave irradiation induced band gap tuning of MoS2-TiO2 nanocomposites

    NASA Astrophysics Data System (ADS)

    Shakya, Jyoti; Mohanty, T.

    2016-05-01

    The MoS2-TiO2 nanocomposites have been synthesized by sol-gel method and characterized by different microscopic and spectroscopic techniques. The crystallinity of these nanocomposites has been confirmed by X-ray diffraction (XRD) analysis. The Raman spectrum of MoS2-TiO2 nanocomposites consists of three distinct peaks (E1 g, E1 2g and A1g) which are associated with TiO2 and MoS2. The morphological study is carried out by scanning electron microscope. The effect of microwave irradiation on the band gap of MoS2-TiO2 nanocomposites has been investigated; it is observed that the microwave irradiation causes decrease in the band gap of MoS2-TiO2 nanocomposites. The microwave treated MoS2-TiO2 thin films offers a novel process route in treating thin films for commercial applications.

  12. Synthesis and characterization of vertically standing MoS2 nanosheets

    PubMed Central

    Li, Han; Wu, Huaqiang; Yuan, Shuoguo; Qian, He

    2016-01-01

    Molybdenum disulfide (MoS2) has been attracting much attentions due to its excellent electrical and optical properties. We report here the synthesis of large-scale and uniform MoS2 nanosheets with vertically standing morphology using chemical vapor deposition method. TEM observations clearly reveal the growth mechanism of these vertical structures. It is suggested that the vertical structures are caused by the compression and extrusion between MoS2 islands. More importantly, the vertical morphology of two dimensional (2D) materials hold many promising potential applications. We demonstrate here the as-synthesized vertically standing MoS2 nanosheets could be used for hydrogen evolution reaction, where the exchange current density is about 70 times of bulk MoS2. The field emission performance of vertically standing MoS2 were also improved due to the abundantly exposed edges. PMID:26888690

  13. Modeling Wettability and Friction of Water on MoS2 Surface

    NASA Astrophysics Data System (ADS)

    Luan, Binquan; Zhou, Ruhong

    The molybdenum disulfide (MoS2) nanosheet is a promising new two-dimensional (2D) material and has recently been used in biological sensing. While the electronic strudture of 2D MoS2 sheet has been extensively studied, the role of its atomic structure and thus the interfacial interactions with bio-fluids are still elusive. Using Molecular dynamics simulations, we modeled the contact angle of water on the MoS2 nanosheet and predicted the slip-length of water (that is not measurable in experiment yet). Simulation results suggest that the MoS2 nanosheet is a hydrophobic and low-friction surface. We expect that our newly developed force fields for depicting surface atoms of MoS2 will facilitate future research in understanding biomolecule-MoS2 interactions in MoS2-based biosensors.

  14. Ab initio study of MoS2 nanotube bundles

    NASA Astrophysics Data System (ADS)

    Verstraete, Matthieu; Charlier, Jean-Christophe

    2003-07-01

    Recently, the synthesis of a new phase of MoS2I1/3 stoichiometry was reported [M. Remskar, A. Mrzel, Z. Skraba, A. Jesih, M. Ceh, J. Demšar, P. Stadelmann, F. Lévy, and D. Mihailovic, Science 292, 479 (2001)]. Electron microscope images and diffraction data were interpreted to indicate bundles of sub-nanometer-diameter single-wall MoS2 nanotubes. After experimental characterization, the structure was attributed to an assembly of “armchair” nanotubes with interstitial iodine. Using first-principles total-energy calculations, bundles of MoS2 nanotubes with different topologies and stoichiometries are investigated. All of the systems are strongly metallic. Configurations with “zigzag” structures are found to be more stable energetically than the “armchair” ones, though all of the structures have similar stabilities. After relaxation, there remain several candidates which give a lattice parameter in relative agreement with experiment. Further, spin-polarized calculations indicate that a structure with armchair tubes iodine atoms in their center acquires a very large spontaneous magnetic moment of 12μB, while the other structures are nonmagnetic. Our ab initio calculations show that in most of the other structures, the tubes are very strongly bound together, and that the compounds should be considered as a crystal, rather than as a bundle of tubes in the habitual sense.

  15. Monolayer MoS2 self-switching diodes

    NASA Astrophysics Data System (ADS)

    Al-Dirini, Feras; Hossain, Faruque M.; Mohammed, Mahmood A.; Hossain, Md Sharafat; Nirmalathas, Ampalavanapillai; Skafidas, Efstratios

    2016-01-01

    This paper presents a new molybdenum disulphide (MoS2) nanodevice that acts as a two-terminal field-effect rectifier. The device is an atomically-thin two-dimensional self-switching diode (SSD) that can be realized within a single MoS2 monolayer with very minimal process steps. Quantum simulation results are presented confirming the device's operation as a diode and showing strong non-linear I-V characteristics. Interestingly, the device shows p-type behavior, in which conduction is dominated by holes as majority charge carriers and the flow of reverse current is enhanced, while the flow of forward current is suppressed, in contrast to monolayer graphene SSDs, which behave as n-type devices. The presence of a large bandgap in monolayer MoS2 results in strong control over the channel, showing complete channel pinch-off in forward conduction, which was confirmed with transmission pathways plots. The device exhibited large leakage tunnelling current through the insulating trenches, which may have been due to the lack of passivation; nevertheless, reverse current remained to be 6 times higher than forward current, showing strong rectification. The effect of p-type substitutional channel doping of sulphur with phosphorus was investigated and showed that it greatly enhances the performance of the device, increasing the reverse-to-forward current rectification ratio more than an order of magnitude, up to a value of 70.

  16. Highly Stretchable MoS2 and Phosphorene Kirigami

    NASA Astrophysics Data System (ADS)

    Campbell, David; Hanakata, Paul; Park, Harold

    Several recent works have shown how nanomesh and kirigami patterning can be used to increase the ductility of monolayer graphene and thin film electrodes, suggesting that this approach should be useful for other 2D materials. We have studied the effects of kirigami patterning on the mechanical properties of MoS2 and phosphorene ``monolayers,'' using classical molecular dynamics simulations. We have explored several different kirigami structures, focusing on two simple non-dimensional parameters found to be relevant in our previous study of graphene. These parameters are related to the density of cuts and to the ratio of the overlapping cut length to the nanoribbon length. We found that these membranes, despite not having the single atomic layer planar structure of graphene, show a significantly enhanced ductility that can be understood in terms of the two geometric parameters. For instance, fracture strains of MoS2 kirigami can be enhanced by a factor of six relative to pristine MoS2 nanoribbons. Our findings suggest that the kirigami cuts are the key to changing the morphology of 2D membranes to allow out of plane deflection and to prevent early failure

  17. MOS flat-band capacitance method at low temperatures

    SciTech Connect

    Huang, C.L.; Gildenblat, G.H. . Dept. of Electrical Engineering)

    1989-08-01

    The expression C/sub FB/ = C/sub ox/ x ({element of}/sub si//L/sub D/)/(C/sub ox/ + ({Epsilon}/sub si//L/sub D/)) (where L/sub D/ is the Debye length), commonly used for the flat-band capacitance of the MOS structure, is invalid in the temperature range below 100 {Kappa}. Consequently, significant error may be encountered when the flat-band capacitance method is used to extract the flat-band voltage V/sub FB/, which is of considerable interest for both the modeling and characterization of MOS devices. To extend this method to low-temperature CMOS applications one has to use a more general model that can be obtained by applying Fermi-Dirac statistics and taking into account the impurity freezeout effect. The authors show that when the temperature dependence of V/sub FB/ is extracted using this approach, the experimental data for n/sup +/ polysilicon gate MOS capacitors are in a good agreement with a simple model.

  18. Electronic properties of MoS2 / MoOx interfaces: Implications in Tunnel Field Effect Transistors and Hole Contacts

    SciTech Connect

    Santosh, K. C.; Longo, Roberto; Addou, Rafik; Wallace, Robert M.; Cho, Kyeongjae

    2016-09-26

    In an electronic device based on two dimensional (2D) transitional metal dichalcogenides (TMDs), finding a low resistance metal contact is critical in order to achieve the desired performance. However, due to the unusual Fermi level pinning in metal/2D TMD interface, the performance is limited. Here, we investigate the electronic properties of TMDs and transition metal oxide (TMO) interfaces (MoS2/MoO3) using density functional theory (DFT). Our results demonstrate that, due to the large work function of MoO3 and the relative band alignment with MoS2, together with small energy gap, the MoS2/MoO3 interface is a good candidate for a tunnel field effect (TFET)-type device. Moreover, if the interface is not stoichiometric because of the presence of oxygen vacancies in MoO3, the heterostructure is more suitable for p-type (hole) contacts, exhibiting an Ohmic electrical behavior as experimentally demonstrated for different TMO/TMD interfaces. Our results reveal that the defect state induced by an oxygen vacancy in the MoO3 aligns with the valance band of MoS2, showing an insignificant impact on the band gap of the TMD. This result highlights the role of oxygen vacancies in oxides on facilitating appropriate contacts at the MoS2 and MoOx (x < 3) interface, which consistently explains the available experimental observations.

  19. Magnetic field effects on superconductivity in alkali metal intercalates of MoS2

    NASA Technical Reports Server (NTRS)

    Woollam, J. A.; Flood, D. J.; Wagoner, D. E.; Somoano, R. B.; Rembaum, A.

    1972-01-01

    The effects of a magnetic field on the superconducting transition in MoS2 intercalated with potassium and sodium were studied. It was found that the potassium intercalated MoS2 has better properties in a magnetic field. In zero magnetic field the transition to superconductivity begins near 6.4 K. Diagrams of the basic circuitry for superconducting transition studies, and charts showing critical magnetic field versus critical temperature for the intercalated MoS2 are included.

  20. Synthesis of hierarchical MoO2/MoS2 nanofibers for electrocatalytic hydrogen evolution.

    PubMed

    Rheem, Youngwoo; Han, Yosep; Lee, Kyu Hwan; Choi, Sung-Mook; Myung, Nosang V

    2017-03-10

    Perpendicularly attached MoS2 nanosheets on MoO2 conductive nanofibers were synthesized by combining electrospinning, calcination, and sulfurization processes. Compared to randomly stacked MoS2 nanosheets on MoO2 nanofiber, they show greater hydrogen evolution reaction (HER) performance (i.e., onset potential of -180 mV versus normal hydrogen electrode with the Tafel slope of 59 mV dec(-1)). HER performance decreases with increasing MoS2 nanocrystal size.

  1. MoS2 nanolayers grown on carbon nanotubes: an advanced reinforcement for epoxy composites.

    PubMed

    Zhou, Keqing; Liu, Jiajia; Shi, Yongqian; Jiang, Saihua; Wang, Dong; Hu, Yuan; Gui, Zhou

    2015-03-25

    In the present study, carbon nanotubes (CNTs) wrapped with MoS2 nanolayers (MoS2-CNTs) were facilely synthesized to obtain advanced hybrids. The structure of the MoS2-CNT hybrids was characterized by X-ray diffraction, Raman spectroscopy, scanning electron microscopy, and transmission electron microscopy measurements. Subsequently, the MoS2-CNT hybrids were incorporated into EP for reducing fire hazards. Compared with pristine CNTs, MoS2-CNT hybrids showed good dispersion in EP matrix and no obvious aggregation of CNTs was observed. The obtained nanocomposites exhibited significant improvements in thermal properties, flame retardancy and mechanical properties, compared with those of neat EP and composites with a single CNT or MoS2. With the incorporation of 2.0 wt % of MoS2-CNT hybrids, the char residues and glass transition temperature (Tg) of the EP composite was significantly increased. Also, the addition of MoS2-CNT hybrids awarded excellent fire resistance to the EP matrix, which was evidenced by the significantly reduced peak heat release rate and total heat release. Moreover, the amount of organic volatiles from EP decomposition was obviously decreased, and the formation of toxic CO was effectively suppressed, implying the toxicity of the volatiles was reduced and smoke production was obviously suppressed. The dramatically reduced fire hazards were generally ascribed to the synergistic effect of MoS2 and CNTs, containing good dispersion of MoS2-CNT hybrids, catalytic char function of MoS2 nanolayers, and physical barrier effects of MoS2 nanolayers and CNT network structure.

  2. Synthesis of hierarchical MoO2/MoS2 nanofibers for electrocatalytic hydrogen evolution

    NASA Astrophysics Data System (ADS)

    Rheem, Youngwoo; Han, Yosep; Lee, Kyu Hwan; Choi, Sung-Mook; Myung, Nosang V.

    2017-03-01

    Perpendicularly attached MoS2 nanosheets on MoO2 conductive nanofibers were synthesized by combining electrospinning, calcination, and sulfurization processes. Compared to randomly stacked MoS2 nanosheets on MoO2 nanofiber, they show greater hydrogen evolution reaction (HER) performance (i.e., onset potential of ‑180 mV versus normal hydrogen electrode with the Tafel slope of 59 mV dec‑1). HER performance decreases with increasing MoS2 nanocrystal size.

  3. Analyses of Transistor Punchthrough Failures

    NASA Technical Reports Server (NTRS)

    Nicolas, David P.

    1999-01-01

    The failure of two transistors in the Altitude Switch Assembly for the Solid Rocket Booster followed by two additional failures a year later presented a challenge to failure analysts. These devices had successfully worked for many years on numerous missions. There was no history of failures with this type of device. Extensive checks of the test procedures gave no indication for a source of the cause. The devices were manufactured more than twenty years ago and failure information on this lot date code was not readily available. External visual exam, radiography, PEID, and leak testing were performed with nominal results Electrical testing indicated nearly identical base-emitter and base-collector characteristics (both forward and reverse) with a low resistance short emitter to collector. These characteristics are indicative of a classic failure mechanism called punchthrough. In failure analysis punchthrough refers to an condition where a relatively low voltage pulse causes the device to conduct very hard producing localized areas of thermal runaway or "hot spots". At one or more of these hot spots, the excessive currents melt the silicon. Heavily doped emitter material diffuses through the base region to the collector forming a diffusion pipe shorting the emitter to base to collector. Upon cooling, an alloy junction forms between the pipe and the base region. Generally, the hot spot (punch-through site) is under the bond and no surface artifact is visible. The devices were delidded and the internal structures were examined microscopically. The gold emitter lead was melted on one device, but others had anomalies in the metallization around the in-tact emitter bonds. The SEM examination confirmed some anomalies to be cosmetic defects while other anomalies were artifacts of the punchthrough site. Subsequent to these analyses, the contractor determined that some irregular testing procedures occurred at the time of the failures heretofore unreported. These testing

  4. Electronic structures and transport properties of a MoS2-NbS2 nanoribbon lateral heterostructure.

    PubMed

    Yang, Zhixiong; Pan, Jiangling; Liu, Qi; Wu, Nannan; Hu, Mengli; Ouyang, Fangping

    2017-01-04

    Lateral heterostructures built from an armchair MoS2 nanoribbon (AMoS2NR) and an armchair NbS2 nanoribbon (ANbS2NR) were studied based on first-principles calculations and a non-equilibrium Green's function method. It is found that the work function of the AMoS2NR shows substantial oscillation with increasing nanoribbon width, which is different from the work functions of other kinds of nanoribbons. The AMoS2NR-ANbS2NR lateral heterostructure exhibits an anomalous transport gap that is much larger than the bandgap of the AMoS2NR. As a result, a field effect transistor with AMoS2NR as the channel and ANbS2NRs as electrodes has high on-off ratios of 10(6)-10(7) and a tiny leakage current of the order of 10(-8) μA. These results suggest that lateral metal-semiconductor heterostructures of transition metal dichalcogenides may have potential applications in nanodevices with low energy consumption.

  5. Fabrication and independent control of patterned polymer gate for a few-layer WSe2 field-effect transistor

    NASA Astrophysics Data System (ADS)

    Hong, Sung Ju; Park, Min; Kang, Hojin; Lee, Minwoo; Jeong, Dae Hong; Park, Yung Woo

    2016-08-01

    We report the fabrication of a patterned polymer electrolyte for a two-dimensional (2D) semiconductor, few-layer tungsten diselenide (WSe2) field-effect transistor (FET). We expose an electron-beam in a desirable region to form the patterned structure. The WSe2 FET acts as a p-type semiconductor in both bare and polymer-covered devices. We observe a highly efficient gating effect in the polymer-patterned device with independent gate control. The patterned polymer gate operates successfully in a molybdenum disulfide (MoS2) FET, indicating the potential for general applications to 2D semiconductors. The results of this study can contribute to large-scale integration and better flexibility in transition metal dichalcogenide (TMD)-based electronics.

  6. Substrate induced anomalous electrostatic and photoluminescence propeties of monolayer MoS2 edges

    NASA Astrophysics Data System (ADS)

    Hao, Song; Yang, Bingchu; Yuan, Jingye; Gao, Yongli

    2017-01-01

    Monolayer MoS2 is an emerging two-dimensional semiconductor with wide-ranging potential applications in the next generation electronic and optoelectronic devices. Understanding the influences of the supporting substrates on the physical properties of grown MoS2 is an important step toward its applications. Here we synthesized two typical rhomboid shaped MoS2 on MoO2 and triangle shaped MoS2 on SiO2/Si substrates and characterized them by multiple means of X-Ray Photoemission Spectroscopy, Atomic Force Microscopy, Electrostatic Force Microscopy, Raman and Photoluminescence techniques. We found that triangle shaped MoS2 exhibits different core level spectra compared with rhomboid shaped MoS2, attributed to dissimilar charge transfer with the underlying SiO2 substrate. Interestingly, the triangle shaped MoS2 single crystals exhibit distinct electrostatic and photoluminescence properties at center and edges. The underlying mechanism is proposed that partial decoupling of MoS2 at edges from SiO2 substrate induces different doping level and strain effects, resulting in anomalous physical properties at edges. The results reported here demonstrate that doping and strain effects induced by substrates have a significant influence on physical properties of monolayer triangle shaped MoS2,which can be generally applicable to other transition metal dichalcogenides materials.

  7. Density functional theory calculation of edge stresses in monolayer MoS2

    NASA Astrophysics Data System (ADS)

    Qi, Zenan; Cao, Penghui; Park, Harold S.

    2013-10-01

    We utilize density functional theory to calculate the edge energy and edge stress for monolayer MoS2 nanoribbons. In contrast to previous reports for graphene, for both armchair and zigzag chiralities, the edge stresses for MoS2 nanoribbons are found to be tensile, indicating that their lowest energy configuration is one of compression in which Mo-S bond lengths are shorter than those in a bulk, periodic MoS2 monolayer. The edge energy and edge stress is found to converge for both chiralities for nanoribbon widths larger than about 1 nm.

  8. Interfacial chemical reactions between MoS2 lubricants and bearing materials

    NASA Technical Reports Server (NTRS)

    Zabinski, J. S.; Tatarchuk, B. J.

    1989-01-01

    XPS and conversion-electron Moessbauer spectroscopy (CEMS) were used to examine iron that was deposited on the basal plane of MoS2 single crystals and subjected to vacuum annealing, oxidizing, and reducing environments. Iron either intercalated into the MoS2 structure or formed oriented iron sulfides, depending on the level of excess S in the MoS2 structure. CEMS data demonstrated that iron sulfide crystal structures preferentially aligned with respect to the MoS2 basal plane, and that alignment (and potentially adhesion) could be varied by appropriate high-temperature annealing procedures.

  9. MoS2-modified ZnO quantum dots nanocomposite: Synthesis and ultrafast humidity response

    NASA Astrophysics Data System (ADS)

    Ze, Lu; Yueqiu, Gong; Xujun, Li; Yong, Zhang

    2017-03-01

    In this work, ZnO quantum dots (QDs), layered MoS2 and MoS2-modified ZnO QDs (MoS2@ZnO QDs) nanocomposite were synthesized and then applied as humidity sensor. The crystal structure, morphology and element distribution of ZnO QDs, MoS2 and MoS2@ZnO QDs were characterized by X-ray diffraction, scanning electron microscopy, transmission electron microscopy and energy dispersive X-ray spectrometry, respectively. The humidity sensing characteristics of the MoS2 and MoS2@ZnO QDs against various relative humidity were measured at room temperature. The results show that the MoS2@ZnO QDs sensor exhibits high sensitivity with an impedance variation of three or four orders of magnitude to relative humidity range of 11-95% and it exhibits a short response-recovery time (1 s for adsorption and 20 s for desorption) and excellent repeatability. The mechanisms of the excellent performance for humidity sensing of MoS2@ZnO QDs sensor were discussed based on its impedance properties. Our work could offer guidelines to design higher performance especially ultrafast humidity response sensor utilizing the nanocomposite structure with two dimensional material and QDs.

  10. Doped organic transistors operating in the inversion and depletion regime

    NASA Astrophysics Data System (ADS)

    Lüssem, Björn; Tietze, Max L.; Kleemann, Hans; Hoßbach, Christoph; Bartha, Johann W.; Zakhidov, Alexander; Leo, Karl

    2013-11-01

    The inversion field-effect transistor is the basic device of modern microelectronics and is nowadays used more than a billion times on every state-of-the-art computer chip. In the future, this rigid technology will be complemented by flexible electronics produced at extremely low cost. Organic field-effect transistors have the potential to be the basic device for flexible electronics, but still need much improvement. In particular, despite more than 20 years of research, organic inversion mode transistors have not been reported so far. Here we discuss the first realization of organic inversion transistors and the optimization of organic depletion transistors by our organic doping technology. We show that the transistor parameters—in particular, the threshold voltage and the ON/OFF ratio—can be controlled by the doping concentration and the thickness of the transistor channel. Injection of minority carriers into the doped transistor channel is achieved by doped contacts, which allows forming an inversion layer.

  11. Ambipolar phosphorene field effect transistor.

    PubMed

    Das, Saptarshi; Demarteau, Marcel; Roelofs, Andreas

    2014-11-25

    In this article, we demonstrate enhanced electron and hole transport in few-layer phosphorene field effect transistors (FETs) using titanium as the source/drain contact electrode and 20 nm SiO2 as the back gate dielectric. The field effect mobility values were extracted to be ∼38 cm(2)/Vs for electrons and ∼172 cm(2)/Vs for the holes. On the basis of our experimental data, we also comprehensively discuss how the contact resistances arising due to the Schottky barriers at the source and the drain end effect the different regime of the device characteristics and ultimately limit the ON state performance. We also propose and implement a novel technique for extracting the transport gap as well as the Schottky barrier height at the metal-phosphorene contact interface from the ambipolar transfer characteristics of the phosphorene FETs. This robust technique is applicable to any ultrathin body semiconductor which demonstrates symmetric ambipolar conduction. Finally, we demonstrate a high gain, high noise margin, chemical doping free, and fully complementary logic inverter based on ambipolar phosphorene FETs.

  12. Performance Limiting Defects in SiC Based Transistors

    DTIC Science & Technology

    2006-11-01

    1 PERFORMANCE LIMITING DEFECTS IN SIC BASED TRANSISTORS P.M. Lenahan*, M.S. Dautrich, C.J. Cochrane, Pennsylvania State University University...oxide semiconductor field effect transistors (MOSFETs) and SiC based bipolar junction transistors (BJTs). The focus has been upon those defects which...of transistors (Lenahan, Jupina, 1990). SDR exploits the fact that recombination in semiconductors is spin dependent (Lepine, 1972; Kaplan et al

  13. 100-GHz Transistors from Wafer-Scale Epitaxial Graphene

    NASA Astrophysics Data System (ADS)

    Lin, Y.-M.; Dimitrakopoulos, C.; Jenkins, K. A.; Farmer, D. B.; Chiu, H.-Y.; Grill, A.; Avouris, Ph.

    2010-02-01

    The high carrier mobility of graphene has been exploited in field-effect transistors that operate at high frequencies. Transistors were fabricated on epitaxial graphene synthesized on the silicon face of a silicon carbide wafer, achieving a cutoff frequency of 100 gigahertz for a gate length of 240 nanometers. The high-frequency performance of these epitaxial graphene transistors exceeds that of state-of-the-art silicon transistors of the same gate length.

  14. Polyphosphonium-based ion bipolar junction transistors

    PubMed Central

    Gabrielsson, Erik O.; Berggren, Magnus

    2014-01-01

    Advancements in the field of electronics during the past few decades have inspired the use of transistors in a diversity of research fields, including biology and medicine. However, signals in living organisms are not only carried by electrons but also through fluxes of ions and biomolecules. Thus, in order to implement the transistor functionality to control biological signals, devices that can modulate currents of ions and biomolecules, i.e., ionic transistors and diodes, are needed. One successful approach for modulation of ionic currents is to use oppositely charged ion-selective membranes to form so called ion bipolar junction transistors (IBJTs). Unfortunately, overall IBJT device performance has been hindered due to the typical low mobility of ions, large geometries of the ion bipolar junction materials, and the possibility of electric field enhanced (EFE) water dissociation in the junction. Here, we introduce a novel polyphosphonium-based anion-selective material into npn-type IBJTs. The new material does not show EFE water dissociation and therefore allows for a reduction of junction length down to 2 μm, which significantly improves the switching performance of the ion transistor to 2 s. The presented improvement in speed as well the simplified design will be useful for future development of advanced iontronic circuits employing IBJTs, for example, addressable drug-delivery devices. PMID:25553192

  15. Polyphosphonium-based ion bipolar junction transistors.

    PubMed

    Gabrielsson, Erik O; Tybrandt, Klas; Berggren, Magnus

    2014-11-01

    Advancements in the field of electronics during the past few decades have inspired the use of transistors in a diversity of research fields, including biology and medicine. However, signals in living organisms are not only carried by electrons but also through fluxes of ions and biomolecules. Thus, in order to implement the transistor functionality to control biological signals, devices that can modulate currents of ions and biomolecules, i.e., ionic transistors and diodes, are needed. One successful approach for modulation of ionic currents is to use oppositely charged ion-selective membranes to form so called ion bipolar junction transistors (IBJTs). Unfortunately, overall IBJT device performance has been hindered due to the typical low mobility of ions, large geometries of the ion bipolar junction materials, and the possibility of electric field enhanced (EFE) water dissociation in the junction. Here, we introduce a novel polyphosphonium-based anion-selective material into npn-type IBJTs. The new material does not show EFE water dissociation and therefore allows for a reduction of junction length down to 2 μm, which significantly improves the switching performance of the ion transistor to 2 s. The presented improvement in speed as well the simplified design will be useful for future development of advanced iontronic circuits employing IBJTs, for example, addressable drug-delivery devices.

  16. High Accuracy Transistor Compact Model Calibrations

    SciTech Connect

    Hembree, Charles E.; Mar, Alan; Robertson, Perry J.

    2015-09-01

    Typically, transistors are modeled by the application of calibrated nominal and range models. These models consists of differing parameter values that describe the location and the upper and lower limits of a distribution of some transistor characteristic such as current capacity. Correspond- ingly, when using this approach, high degrees of accuracy of the transistor models are not expected since the set of models is a surrogate for a statistical description of the devices. The use of these types of models describes expected performances considering the extremes of process or transistor deviations. In contrast, circuits that have very stringent accuracy requirements require modeling techniques with higher accuracy. Since these accurate models have low error in transistor descriptions, these models can be used to describe part to part variations as well as an accurate description of a single circuit instance. Thus, models that meet these stipulations also enable the calculation of quantifi- cation of margins with respect to a functional threshold and uncertainties in these margins. Given this need, new model high accuracy calibration techniques for bipolar junction transis- tors have been developed and are described in this report.

  17. Structural influence of proteins upon adsorption to MoS2 nanomaterials: comparison of MoS2 force field parameters.

    PubMed

    Gu, Zonglin; De Luna, Phil; Yang, Zaixing; Zhou, Ruhong

    2017-01-25

    Molybdenum disulfide (MoS2) has recently emerged as a promising nanomaterial in a wide range of applications due to its unique and impressive properties. For example, MoS2 has gained attention in the biomedical field because of its ability to act as an antibacterial and anticancer agent. However, the potential influence of this exciting nanomaterial on biomolecules is yet to be extensively studied. Molecular dynamics (MD) simulations are invaluable tools in the examination of protein interactions with nanomaterials such as MoS2. Previous protein MD studies have employed MoS2 force field parameters which were developed to accurately model bulk crystal structures and thermal heat transport but may not necessarily be amendable to its properties at the interface with biomolecules. By adopting a newly developed MoS2 force field, which was designed to better capture its interaction with water and proteins, we have examined the changes in protein structures between the original and refitted MoS2 force field parameters of three representative proteins, polyalanine (α-helix), YAP65 WW-domains (β-sheet), and HP35 (globular protein) when adsorbed onto MoS2 nanomaterials. We find that the original force field, with much larger van der Waals (vdW) contributions, resulted in more dramatic protein structural damage than the refitted parameters. Importantly, some denaturation of the protein tertiary structure and the local secondary structure persisted with the refitted force field albeit overall less severe MoS2 denaturation capacity was found. This work suggests that the denaturation ability of MoS2 to the protein structure is not as dire as previously reported and provides noteworthy findings on the dynamic interactions of proteins with this emergent material.

  18. Enhanced dielectric deposition on single-layer MoS2 with low damage using remote N2 plasma treatment.

    PubMed

    Qian, Qingkai; Zhang, Zhaofu; Hua, Mengyuan; Tang, Gaofei; Lei, Jiacheng; Lan, Feifei; Xu, Yongkuan; Yan, Ruyue; Chen, Kevin J

    2017-04-28

    Using remote N2 plasma treatment to promote dielectric deposition on the dangling-bond free MoS2 is explored for the first time. The N2 plasma induced damages are systematically studied by the defect-sensitive acoustic-phonon Raman of single-layer MoS2, with samples undergoing O2 plasma treatment as a comparison. O2 plasma treatment causes defects in MoS2 mainly by oxidizing MoS2 along the already defective sites (most likely the flake edges), which results in the layer oxidation of MoS2. In contrast, N2 plasma causes defects in MoS2 mainly by straining and mechanically distorting the MoS2 layers first. Owing to the relatively strong MoS2-substrate interaction and chemical inertness of MoS2 in N2 plasma, single-layer MoS2 shows great stability in N2 plasma and only stable point defects are introduced after long-duration N2 plasma exposure. Considering the enormous vulnerability of single-layer MoS2 in O2 plasma and the excellent stability of single-layer MoS2 in N2 plasma, the remote N2 plasma treatment shows great advantage as surface functionalization to promote dielectric deposition on single-layer MoS2.

  19. Tunneling field effect transistor integrated with black phosphorus-MoS2 junction and ion gel dielectric

    NASA Astrophysics Data System (ADS)

    Xu, Jiao; Jia, Jingyuan; Lai, Shen; Ju, Jaehyuk; Lee, Sungjoo

    2017-01-01

    We report an interband tunneling field effect transistor (TFET) integrated with a Black Phosphorus (BP)-MoS2 junction and ion gel as a top gate dielectric. The operation of the BP-MOS2 TFET is based on the modulation of the energy band alignment of the BP-MoS2 junction with electrostatic gating control on the MoS2 channel from the top gate through the ion gel dielectric and the supply of tunneling carriers from the BP source, which is degenerately doped with ion gel. The obtained subthreshold swing of the BP-MoS2 TFET reached 65 mV/dec at room temperature and 51 mV/dec at 160 K, maintaining low SS values in more than 2 orders of drain current range. The demonstrated interband TFET based on the BP-MoS2 junction shows significant promise for further application to a new class of two-dimensional functional devices.

  20. Proton Damage Effects on Carbon Nanotube Field-Effect Transistors

    DTIC Science & Technology

    2014-06-19

    PROTON DAMAGE EFFECTS ON CARBON NANOTUBE FIELD-EFFECT TRANSISTORS THESIS Evan R. Kemp, Ctr...United States. AFIT-ENP-T-14-J-39 PROTON DAMAGE EFFECTS ON CARBON NANOTUBE FIELD-EFFECT TRANSISTORS THESIS Presented to...PROTON DAMAGE EFFECTS ON CARBON NANOTUBE FIELD-EFFECT TRANSISTORS Evan R. Kemp, BS Ctr, USAF Approved: // Signed

  1. Self-protecting transistor oscillator for treating animal tissues

    DOEpatents

    Doss, James D.

    1980-01-01

    A transistor oscillator circuit wherein the load current applied to animal tissue treatment electrodes is fed back to the transistor. Removal of load is sensed to automatically remove feedback and stop oscillations. A thermistor on one treatment electrode senses temperature, and by means of a control circuit controls oscillator transistor current.

  2. Bipolar-FET combinational power transistors for power conversion applications

    NASA Technical Reports Server (NTRS)

    Chen, D. Y.; Chin, S. A.

    1984-01-01

    Four bipolar-FET (field-effect transistor) combinational transistor configurations are compared from the application point of view. The configurations included are FET-Darlington (cascade), emitter-open switch (cascode), parallel configuration, and FET-gated bipolar transistors (FGT).

  3. Stretchable transistors with buckled carbon nanotube films as conducting channels

    DOEpatents

    Arnold, Michael S; Xu, Feng

    2015-03-24

    Thin-film transistors comprising buckled films comprising carbon nanotubes as the conductive channel are provided. Also provided are methods of fabricating the transistors. The transistors, which are highly stretchable and bendable, exhibit stable performance even when operated under high tensile strains.

  4. Discrete transistor measuring and matching using a solid core oven

    NASA Astrophysics Data System (ADS)

    Inkinen, M.; Mäkelä, K.; Vuorela, T.; Palovuori, K.

    2013-03-01

    This paper presents transistor measurements done at a constant temperature. The aim in this research was to develop a reliable and repeatable method for measuring and searching transistor pairs with similar parameters, as in certain applications it is advantageous to use transistors from the same production batch due to the significant variability in batches from different manufacturers. Transistor manufacturing methods are well established, but due to the large variability in tolerance, not even transistors from the same manufacturing batch have identical properties. Transistors' electrical properties are also strongly temperature-dependent. Therefore, when measuring transistor properties, the temperature must be kept constant. For the measurement process, a solid-core oven providing stable temperature was implemented. In the oven, the base-to-emitter voltage (VBE) and DC-current gain (β) of 32 transistors could be measured simultaneously. The oven's temperature was controlled with a programmable thermostat, which allowed accurate constant temperature operation. The oven is formed by a large metal block with an individual chamber for each transistor to be measured. Isolation of individual transistors and the highly thermally conductive metal core structure prevent thermal coupling between transistors. The oven enables repeatable measurements, and thus measurements between different batches are comparable. In this research study, the properties of over 5000 transistors were measured and the variance of the aforementioned properties was analyzed.

  5. Discrete transistor measuring and matching using a solid core oven.

    PubMed

    Inkinen, M; Mäkelä, K; Vuorela, T; Palovuori, K

    2013-03-01

    This paper presents transistor measurements done at a constant temperature. The aim in this research was to develop a reliable and repeatable method for measuring and searching transistor pairs with similar parameters, as in certain applications it is advantageous to use transistors from the same production batch due to the significant variability in batches from different manufacturers. Transistor manufacturing methods are well established, but due to the large variability in tolerance, not even transistors from the same manufacturing batch have identical properties. Transistors' electrical properties are also strongly temperature-dependent. Therefore, when measuring transistor properties, the temperature must be kept constant. For the measurement process, a solid-core oven providing stable temperature was implemented. In the oven, the base-to-emitter voltage (VBE) and DC-current gain (β) of 32 transistors could be measured simultaneously. The oven's temperature was controlled with a programmable thermostat, which allowed accurate constant temperature operation. The oven is formed by a large metal block with an individual chamber for each transistor to be measured. Isolation of individual transistors and the highly thermally conductive metal core structure prevent thermal coupling between transistors. The oven enables repeatable measurements, and thus measurements between different batches are comparable. In this research study, the properties of over 5000 transistors were measured and the variance of the aforementioned properties was analyzed.

  6. Advances in organic transistor-based biosensors: from organic electrochemical transistors to electrolyte-gated organic field-effect transistors.

    PubMed

    Kergoat, Loïg; Piro, Benoît; Berggren, Magnus; Horowitz, Gilles; Pham, Minh-Chau

    2012-02-01

    Organic electronics have, over the past two decades, developed into an exciting area of research and technology to replace classic inorganic semiconductors. Organic photovoltaics, light-emitting diodes, and thin-film transistors are already well developed and are currently being commercialized for a variety of applications. More recently, organic transistors have found new applications in the field of biosensors. The progress made in this direction is the topic of this review. Various configurations are presented, with their detection principle, and illustrated by examples from the literature.

  7. Highly stable 2D material (2DM) field-effect transistors (FETs) with wafer-scale multidyad encapsulation.

    PubMed

    Kim, Choong-Ki; Jeong, Eun Gyo; Kim, Eungtaek; Song, Jeong-Gyu; Kim, Youngjun; Woo, Whang Je; Lee, Myung Keun; Bae, Hagyoul; Jeon, Seong-Bae; Kim, Hyungjun; Choi, Kyung Cheol; Choi, Yang-Kyu

    2017-02-03

    Field-effect transistors (FETs) composed of 2D materials (2DMs) such as transition-metal dichalcogenide (TMD) materials show unstable electrical characteristics in ambient air due to the high sensitivity of 2DMs to water adsorbates. In this work, in order to demonstrate the long-term retention of electrical characteristics of a TMD FET, a multidyad encapsulation method was applied to a MoS2 FET and thereby its durability was warranted for one month. It was well known that the multidyad encapsulation method was effective to mitigate high sensitivity to ambient air in light-emitting diodes (LEDs) composed of organic materials. However, there was no attempt to check the feasibility of such a multidyad encapsulation method for 2DM FETs. It is timely to investigate the water vapor transmission ratio (WVTR) required for long-term stability of 2DM FETs. The 2DM FETs were fabricated with MoS2 flakes by both an exfoliation method, that is desirable to attain high quality film, and a chemical vapor deposition (CVD) method, that is applicable to fabrication for a large-sized substrate. In order to eliminate other unwanted variables, the MoS2 FETs composed of exfoliated flakes were primarily investigated to assure the effectiveness of the encapsulation method. The encapsulation method uses multiple dyads comprised of a polymer layer by spin coating and an Al2O3 layer deposited by atomic layer deposition (ALD). The proposed method shows wafer-scale uniformity, high transparency, and protective barrier properties against adsorbates (WVTR of 8 × 10(-6) g m(-2) day(-1)) over one month.

  8. Highly stable 2D material (2DM) field-effect transistors (FETs) with wafer-scale multidyad encapsulation

    NASA Astrophysics Data System (ADS)

    Kim, Choong-Ki; Gyo Jeong, Eun; Kim, Eungtaek; Song, Jeong-Gyu; Kim, Youngjun; Woo, Whang Je; Lee, Myung Keun; Bae, Hagyoul; Jeon, Seong-Bae; Kim, Hyungjun; Choi, Kyung Cheol; Choi, Yang-Kyu

    2017-02-01

    Field-effect transistors (FETs) composed of 2D materials (2DMs) such as transition-metal dichalcogenide (TMD) materials show unstable electrical characteristics in ambient air due to the high sensitivity of 2DMs to water adsorbates. In this work, in order to demonstrate the long-term retention of electrical characteristics of a TMD FET, a multidyad encapsulation method was applied to a MoS2 FET and thereby its durability was warranted for one month. It was well known that the multidyad encapsulation method was effective to mitigate high sensitivity to ambient air in light-emitting diodes (LEDs) composed of organic materials. However, there was no attempt to check the feasibility of such a multidyad encapsulation method for 2DM FETs. It is timely to investigate the water vapor transmission ratio (WVTR) required for long-term stability of 2DM FETs. The 2DM FETs were fabricated with MoS2 flakes by both an exfoliation method, that is desirable to attain high quality film, and a chemical vapor deposition (CVD) method, that is applicable to fabrication for a large-sized substrate. In order to eliminate other unwanted variables, the MoS2 FETs composed of exfoliated flakes were primarily investigated to assure the effectiveness of the encapsulation method. The encapsulation method uses multiple dyads comprised of a polymer layer by spin coating and an Al2O3 layer deposited by atomic layer deposition (ALD). The proposed method shows wafer-scale uniformity, high transparency, and protective barrier properties against adsorbates (WVTR of 8 × 10-6 g m-2 day-1) over one month.

  9. Characteristics of lateral and hybrid heterostructures based on monolayer MoS2: a computational study.

    PubMed

    Feng, Li-Ping; Su, Jie; Liu, Zheng-Tang

    2017-02-08

    Novel MoS2/(MX2)n lateral and (MoS2)/(MX2)n-BN hybrid heterostructures have been designed on monolayer MoS2 to extend its applications. The electronic, interfacial and optical properties of the lateral and hybrid heterostructures have been investigated comparatively using first-principles calculations. It was found that the charge distributions, band gaps, band levels, electrostatic potentials, and optical absorption of the MoS2/(MX2)n lateral heterostructures depend greatly on the width n of MX2, irrespective of the size of the lateral heterostructures. The CBM states of the MoS2/(MX2)n lateral heterostructures dominated by the dz(2) orbitals are localized around MoS2, whereas the VBM states of the MoS2/(MX2)n lateral heterostructures are dominated by the MX2 region. Through regulating the width n of the MX2 region in the MoS2/(MX2)n lateral heterostructures, the optical absorption of the lateral heterostructures under visible light can be increased, and the CBM and VBM states of the lateral heterostructures can be located above the hydrogen reduction potential and below the water oxidation potential, respectively. The similar characteristics were observed in the MoS2/(MX2)n-BN hybrid heterostructures, indicating that BN is a good substrate for the MoS2/(MX2)n lateral heterostructures. The analysis implies that forming the lateral and hybrid heterostructures is an effective way to extend the applications of monolayer MoS2 in photocatalytic water and photovoltaic devices.

  10. High Performance Airbrushed Organic Thin Film Transistors

    SciTech Connect

    Chan, C.; Richter, L; Dinardo, B; Jaye, C; Conrad, B; Ro, H; Germack, D; Fischer, D; DeLongchamp, D; Gunlach, D

    2010-01-01

    Spray-deposited poly-3-hexylthiophene (P3HT) transistors were characterized using electrical and structural methods. Thin-film transistors with octyltrichlorosilane treated gate dielectrics and spray-deposited P3HT active layers exhibited a saturation regime mobility as high as 0.1 cm{sup 2} V{sup -1} s{sup -1}, which is comparable to the best mobilities observed in high molecular mass P3HT transistors prepared using other methods. Optical and atomic force microscopy showed the presence of individual droplets with an average diameter of 20 {micro}m and appreciable large-scale film inhomogeneities. Despite these inhomogeneities, near-edge x-ray absorption fine structure spectroscopy of the device-relevant channel interface indicated excellent orientation of the P3HT.

  11. A Heteroepitaxial Perovskite Metal-Base Transistor

    SciTech Connect

    Yajima, T.; Hikita, Y.; Hwang, H.Y.; /Tokyo U. /JST, PRESTO /SLAC

    2011-08-11

    'More than Moore' captures a concept for overcoming limitations in silicon electronics by incorporating new functionalities in the constituent materials. Perovskite oxides are candidates because of their vast array of physical properties in a common structure. They also enable new electronic devices based on strongly-correlated electrons. The field effect transistor and its derivatives have been the principal oxide devices investigated thus far, but another option is available in a different geometry: if the current is perpendicular to the interface, the strong internal electric fields generated at back-to-back heterojunctions can be used for oxide electronics, analogous to bipolar transistors. Here we demonstrate a perovskite heteroepitaxial metal-base transistor operating at room temperature, enabled by interface dipole engineering. Analysis of many devices quantifies the evolution from hot-electron to permeable-base behaviour. This device provides a platform for incorporating the exotic ground states of perovskite oxides, as well as novel electronic phases at their interfaces.

  12. A heteroepitaxial perovskite metal-base transistor.

    PubMed

    Yajima, Takeaki; Hikita, Yasuyuki; Hwang, Harold Y

    2011-03-01

    'More than Moore' captures a concept for overcoming limitations in silicon electronics by incorporating new functionalities in the constituent materials. Perovskite oxides are candidates because of their vast array of physical properties in a common structure. They also enable new electronic devices based on strongly-correlated electrons. The field effect transistor and its derivatives have been the principal oxide devices investigated thus far, but another option is available in a different geometry: if the current is perpendicular to the interface, the strong internal electric fields generated at back-to-back heterojunctions can be used for oxide electronics, analogous to bipolar transistors. Here we demonstrate a perovskite heteroepitaxial metal-base transistor operating at room temperature, enabled by interface dipole engineering. Analysis of many devices quantifies the evolution from hot-electron to permeable-base behaviour. This device provides a platform for incorporating the exotic ground states of perovskite oxides, as well as novel electronic phases at their interfaces.

  13. Thin Film Transistors On Plastic Substrates

    DOEpatents

    Carey, Paul G.; Smith, Patrick M.; Sigmon, Thomas W.; Aceves, Randy C.

    2004-01-20

    A process for formation of thin film transistors (TFTs) on plastic substrates replaces standard thin film transistor fabrication techniques, and uses sufficiently lower processing temperatures so that inexpensive plastic substrates may be used in place of standard glass, quartz, and silicon wafer-based substrates. The silicon based thin film transistor produced by the process includes a low temperature substrate incapable of withstanding sustained processing temperatures greater than about 250.degree. C., an insulating layer on the substrate, a layer of silicon on the insulating layer having sections of doped silicon, undoped silicon, and poly-silicon, a gate dielectric layer on the layer of silicon, a layer of gate metal on the dielectric layer, a layer of oxide on sections of the layer of silicon and the layer of gate metal, and metal contacts on sections of the layer of silicon and layer of gate metal defining source, gate, and drain contacts, and interconnects.

  14. Transistors using crystalline silicon devices on glass

    DOEpatents

    McCarthy, A.M.

    1995-05-09

    A method is disclosed for fabricating transistors using single-crystal silicon devices on glass. This method overcomes the potential damage that may be caused to the device during high voltage bonding and employs a metal layer which may be incorporated as part of the transistor. This is accomplished such that when the bonding of the silicon wafer or substrate to the glass substrate is performed, the voltage and current pass through areas where transistors will not be fabricated. After removal of the silicon substrate, further metal may be deposited to form electrical contact or add functionality to the devices. By this method both single and gate-all-around devices may be formed. 13 figs.

  15. EDITORIAL: Reigniting innovation in the transistor Reigniting innovation in the transistor

    NASA Astrophysics Data System (ADS)

    Demming, Anna

    2012-09-01

    Today the transistor is integral to the electronic circuitry that wires our lives. When Bardeen and Brattain first observed an amplified signal by connecting electrodes to a germanium crystal they saw that their 'semiconductor triode' could prove a useful alternative to the more cumbersome vacuum tubes used at the time [1]. But it was perhaps William Schottky who recognized the extent of the transistor's potential. A basic transistor has three or more terminals and current across one pair of terminals can switch or amplify current through another pair. Bardeen, Brattain and Schottky were jointly awarded a Nobel Prize in 1956 'for their researches on semiconductors and their discovery of the transistor effect' [2]. Since then many new forms of the transistor have been developed and understanding of the underlying properties is constantly advancing. In this issue Chen and Shih and colleagues at Taiwan National University and Drexel University report a pyroelectrics transistor. They show how a novel optothermal gating mechanism can modulate the current, allowing a range of developments in nanoscale optoelectronics and wireless devices [3]. The explosion of interest in nanoscale devices in the 1990s inspired electronics researchers to look for new systems that can act as transistors, such as carbon nanotube [4] and silicon nanowire [5] transistors. Generally these transistors function by raising and lowering an energy barrier of kBT -1, but researchers in the US and Canada have demonstrated that the quantum interference between two electronic pathways through aromatic molecules can also modulate the current flow [6]. The device has advantages for further miniaturization where energy dissipation in conventional systems may eventually cause complications. Interest in transistor technology has also led to advances in fabrication techniques for achieving high production quantities, such as printing [7]. Researchers in Florida in the US demonstrated field effect transistor

  16. Two-dimensional nanosheets of MoS2: a promising material with high dielectric properties and microwave absorption performance

    NASA Astrophysics Data System (ADS)

    Ning, Ming-Qiang; Lu, Ming-Ming; Li, Jing-Bo; Chen, Zhuo; Dou, Yan-Kun; Wang, Cheng-Zhi; Rehman, Fida; Cao, Mao-Sheng; Jin, Hai-Bo

    2015-09-01

    In this study, few-layered MoS2 nanosheets (MoS2-NS) were obtained via the top-down exfoliation method from bulk MoS2 (MoS2-Bulk), and the dielectric properties and microwave absorption performance of MoS2-NS were first reported. The dimension-dependent dielectric properties and microwave absorption performance of MoS2 were investigated by presenting a comparative study between MoS2-NS and MoS2-Bulk. Our results show that the imaginary permittivity (ε'') of MoS2-NS/wax is twice as large as that of MoS2-Bulk/wax. The minimum reflection loss (RL) value of MoS2-NS/wax with 60 wt% loading is -38.42 dB at a thickness of 2.4 mm, which is almost 4 times higher than that of MoS2-Bulk/wax, and the corresponding bandwidth with effective attenuation (<-10 dB) of MoS2-NS/wax is up to 4.1 GHz (9.6-13.76 GHz). The microwave absorption performance of MoS2-NS is comparable to those reported in carbon-related nanomaterials. The enhanced microwave absorption performance of MoS2-NS is attributed to the defect dipole polarization arising from Mo and S vacancies and its higher specific surface area. These results suggest that MoS2-NS is a promising candidate material not only in fundamental studies but also in practical microwave applications.In this study, few-layered MoS2 nanosheets (MoS2-NS) were obtained via the top-down exfoliation method from bulk MoS2 (MoS2-Bulk), and the dielectric properties and microwave absorption performance of MoS2-NS were first reported. The dimension-dependent dielectric properties and microwave absorption performance of MoS2 were investigated by presenting a comparative study between MoS2-NS and MoS2-Bulk. Our results show that the imaginary permittivity (ε'') of MoS2-NS/wax is twice as large as that of MoS2-Bulk/wax. The minimum reflection loss (RL) value of MoS2-NS/wax with 60 wt% loading is -38.42 dB at a thickness of 2.4 mm, which is almost 4 times higher than that of MoS2-Bulk/wax, and the corresponding bandwidth with effective attenuation (<-10

  17. Characterization of interface states in Al2O3/AlGaN/GaN structures for improved performance of high-electron-mobility transistors

    NASA Astrophysics Data System (ADS)

    Hori, Y.; Yatabe, Z.; Hashizume, T.

    2013-12-01

    We have investigated the relationship between improved electrical properties of Al2O3/AlGaN/GaN metal-oxide-semiconductor high-electron-mobility transistors (MOS-HEMTs) and electronic state densities at the Al2O3/AlGaN interface evaluated from the same structures as the MOS-HEMTs. To evaluate Al2O3/AlGaN interface state densities of the MOS-HEMTs, two types of capacitance-voltage (C-V) measurement techniques were employed: the photo-assisted C-V measurement for the near-midgap states and the frequency dependent C-V characteristics for the states near the conduction-band edge. To reduce the interface states, an N2O-radical treatment was applied to the AlGaN surface just prior to the deposition of the Al2O3 insulator. As compared to the sample without the treatment, the N2O-radical treated Al2O3/AlGaN/GaN structure showed smaller frequency dispersion of the C-V curves in the positive gate bias range. The state densities at the Al2O3/AlGaN interface were estimated to be 1 × 1012 cm-2 eV-1 or less around the midgap and 8 × 1012 cm-2 eV-1 near the conduction-band edge. In addition, we observed higher maximum drain current at the positive gate bias and suppressed threshold voltage instability under the negative gate bias stress even at 150 °C. Results presented in this paper indicated that the N2O-radical treatment is effective both in reducing the interface states and improving the electrical properties of the Al2O3/AlGaN/GaN MOS-HEMTs.

  18. VHDL simulation with access to transistor models

    NASA Technical Reports Server (NTRS)

    Gibson, J.

    1991-01-01

    Hardware description languages such as VHDL have evolved to aid in the design of systems with large numbers of elements and a wide range of electronic and logical abstractions. For high performance circuits, behavioral models may not be able to efficiently include enough detail to give designers confidence in a simulation's accuracy. One option is to provide a link between the VHDL environment and a transistor level simulation environment. The coupling of the Vantage Analysis Systems VHDL simulator and the NOVA simulator provides the combination of VHDL modeling and transistor modeling.

  19. Switching Characteristics of Ferroelectric Transistor Inverters

    NASA Technical Reports Server (NTRS)

    Laws, Crystal; Mitchell, Coey; MacLeod, Todd C.; Ho, Fat D.

    2010-01-01

    This paper presents the switching characteristics of an inverter circuit using a ferroelectric field effect transistor, FeFET. The propagation delay time characteristics, phl and plh are presented along with the output voltage rise and fall times, rise and fall. The propagation delay is the time-delay between the V50% transitions of the input and output voltages. The rise and fall times are the times required for the output voltages to transition between the voltage levels V10% and V90%. Comparisons are made between the MOSFET inverter and the ferroelectric transistor inverter.

  20. Total Dose Effects in Conventional Bipolar Transistors

    NASA Technical Reports Server (NTRS)

    Johnston, A. H.; Swift, G. W.; Rax, B. G.

    1994-01-01

    This paper examines various factors in bipolar device construction and design, and discusses their impact on radiation hardness. The intent of the paper is to improve understanding of the underlying mechanisms for practical devices without special test structures, and to provide (1) guidance in ways to select transistor designs that are more resistant to radiation damage, and (2) methods to estimate the maximum amount of damage that might be expected from a basic transistor design. The latter factor is extremely important in assessing the risk that future lots of devices will be substantially below design limits, which are usually based on test data for older devices.

  1. Going ballistic: Graphene hot electron transistors

    NASA Astrophysics Data System (ADS)

    Vaziri, S.; Smith, A. D.; Östling, M.; Lupina, G.; Dabrowski, J.; Lippert, G.; Mehr, W.; Driussi, F.; Venica, S.; Di Lecce, V.; Gnudi, A.; König, M.; Ruhl, G.; Belete, M.; Lemme, M. C.

    2015-12-01

    This paper reviews the experimental and theoretical state of the art in ballistic hot electron transistors that utilize two-dimensional base contacts made from graphene, i.e. graphene base transistors (GBTs). Early performance predictions that indicated potential for THz operation still hold true today, even with improved models that take non-idealities into account. Experimental results clearly demonstrate the basic functionality, with on/off current switching over several orders of magnitude, but further developments are required to exploit the full potential of the GBT device family. In particular, interfaces between graphene and semiconductors or dielectrics are far from perfect and thus limit experimental device integrity, reliability and performance.

  2. Voltage Amplifier Based on Organic Electrochemical Transistor

    PubMed Central

    Braendlein, Marcel; Lonjaret, Thomas; Leleux, Pierre; Badier, Jean‐Michel

    2016-01-01

    Organic electrochemical transistors (OECTs) are receiving a great deal of attention as amplifying transducers for electrophysiology. A key limitation of this type of transistors, however, lies in the fact that their output is a current, while most electrophysiology equipment requires a voltage input. A simple circuit is built and modeled that uses a drain resistor to produce a voltage output. It is shown that operating the OECT in the saturation regime provides increased sensitivity while maintaining a linear signal transduction. It is demonstrated that this circuit provides high quality recordings of the human heart using readily available electrophysiology equipment, paving the way for the use of OECTs in the clinic. PMID:28105401

  3. Static Characteristics of the Ferroelectric Transistor Inverter

    NASA Technical Reports Server (NTRS)

    Mitchell, Cody; Laws, crystal; MacLeond, Todd C.; Ho, Fat D.

    2010-01-01

    The inverter is one of the most fundamental building blocks of digital logic, and it can be used as the foundation for understanding more complex logic gates and circuits. This paper presents the characteristics of an inverter circuit using a ferroelectric field-effect transistor. The voltage transfer characteristics are analyzed with respect to varying parameters such as supply voltage, input voltage, and load resistance. The effects of the ferroelectric layer between the gate and semiconductor are examined, and comparisons are made between the inverters using ferroelectric transistors and those using traditional MOSFETs.

  4. Organic field effect transistors for textile applications.

    PubMed

    Bonfiglio, Annalisa; De Rossi, Danilo; Kirstein, Tünde; Locher, Ivo R; Mameli, Fulvia; Paradiso, Rita; Vozzi, Giovanni

    2005-09-01

    In this paper, several issues concerning the development of textiles endowed with electronic functions will be discussed. In particular, issues concerning materials, structures, electronic models, and the mechanical constraints due to textile technologies will be detailed. The idea starts from an already developed organic field-effect transistor that is realized on a flexible film that can be applied, after the assembly, on whatever kind of substrate, in particular, on textiles. This could pave the way to a variety of applications aimed to conjugate the favorable mechanical properties of textiles with the electronic functions of transistors. Furthermore, a possible perspective for the developments of organic sensors based on this structure are described.

  5. Graphene Field Effect Transistor for Radiation Detection

    NASA Technical Reports Server (NTRS)

    Li, Mary J. (Inventor); Chen, Zhihong (Inventor)

    2016-01-01

    The present invention relates to a graphene field effect transistor-based radiation sensor for use in a variety of radiation detection applications, including manned spaceflight missions. The sensing mechanism of the radiation sensor is based on the high sensitivity of graphene in the local change of electric field that can result from the interaction of ionizing radiation with a gated undoped silicon absorber serving as the supporting substrate in the graphene field effect transistor. The radiation sensor has low power and high sensitivity, a flexible structure, and a wide temperature range, and can be used in a variety of applications, particularly in space missions for human exploration.

  6. Principles to Products: Toward Realizing MOS 2.0

    NASA Technical Reports Server (NTRS)

    Bindschadler, Duane L.; Delp, Christopher L.

    2012-01-01

    This is a report on the Operations Revitalization Initiative, part of the ongoing NASA-funded Advanced Multi-Mission Operations Systems (AMMOS) program. We are implementing products that significantly improve efficiency and effectiveness of Mission Operations Systems (MOS) for deep-space missions. We take a multi-mission approach, in keeping with our organization's charter to "provide multi-mission tools and services that enable mission customers to operate at a lower total cost to NASA." Focusing first on architectural fundamentals of the MOS, we review the effort's progress. In particular, we note the use of stakeholder interactions and consideration of past lessons learned to motivate a set of Principles that guide the evolution of the AMMOS. Thus guided, we have created essential patterns and connections (detailed in companion papers) that are explicitly modeled and support elaboration at multiple levels of detail (system, sub-system, element...) throughout a MOS. This architecture is realized in design and implementation products that provide lifecycle support to a Mission at the system and subsystem level. The products include adaptable multi-mission engineering documentation that describes essentials such as operational concepts and scenarios, requirements, interfaces and agreements, information models, and mission operations processes. Because we have adopted a model-based system engineering method, these documents and their contents are meaningfully related to one another and to the system model. This means they are both more rigorous and reusable (from mission to mission) than standard system engineering products. The use of models also enables detailed, early (e.g., formulation phase) insight into the impact of changes (e.g., to interfaces or to software) that is rigorous and complete, allowing better decisions on cost or technical trades. Finally, our work provides clear and rigorous specification of operations needs to software developers, further

  7. MOS spectroscopy with the JWST Near-Infrared Spectrometer

    NASA Astrophysics Data System (ADS)

    Karakla, Diane M.; Beck, Tracy; Gilbert, Karoline; Pontoppidan, Klaus Martin; Curtis, Gary; Shyrokov, Alexander

    2015-08-01

    The James Webb Space Telescope's Near-Infrared Spectrograph (NIRSpec) will feature astronomy’s first space-based, multi-object spectroscopic (MOS) capability enabled by the instrument’s micro-shutter array (MSA). The MSA is a four-quadrant fixed grid of nearly 250,000 tiny shutters that can be configured into slits on multiple astronomical targets in a field. In MOS mode, NIRSpec can obtain spectra of more than 100 targets simultaneously in one of three spectral bands (1.0 - 1.8 μm, 1.7 - 3.0 μm, and 2.9 - 5.0 μm) at medium (R~1000) or high resolution (R~2700) with the gratings, or at lower resolution (R~100, 0.6 - 5.0 μm) with the PRISM. The NIRSpec team and software developers at the Space Telescope Science Institute (STScI) have developed an MSA Planning Tool (MPT) to facilitate the complex observation planning process for a variety of observing strategies. The purpose of the tool is to find optimal pointings on the sky where many sources (or many high-valued sources) can be observed at a given pointing, or through a set of telescope dithers, and to design the associated MSA configurations at each position. The MPT is available to the astronomical community as part of the Astronomer’s Proposal Tool (APT), an integrated software package developed by STScI for the preparation of observing proposals. We will summarize the operational concept for MOS spectroscopy with the instrument, describe the MSA Planning Tool and its algorithms, and highlight recent developments that extend the tool’s applicability to diverse science cases.

  8. TEM Lattice Imaging of the Nanostructure of Early-Growth Sputter- Deposited MoS2 Solid Lubricant Films

    DTIC Science & Technology

    1990-09-30

    REFERENCES ....................................................... 45 3 FIGURES 1. The MoS2 crystal structure ................................... 8...contains anisotropic islands ........... 16 4. Diffraction pattern of an HT MoS2 film ....................... 17 5. Diffraction pattern of an AT MoS2 film...18 6. (A) Bright-field (BF) image of an HT MoS2 film, (B) a corresponding (002) dark-field image, (C) a (100) dark-field image

  9. General Thermal Texturization Process of MoS2 for Efficient Electrocatalytic Hydrogen Evolution Reaction.

    PubMed

    Kiriya, Daisuke; Lobaccaro, Peter; Nyein, Hnin Yin Yin; Taheri, Peyman; Hettick, Mark; Shiraki, Hiroshi; Sutter-Fella, Carolin M; Zhao, Peida; Gao, Wei; Maboudian, Roya; Ager, Joel W; Javey, Ali

    2016-07-13

    Molybdenum disulfide (MoS2) has been widely examined as a catalyst containing no precious metals for the hydrogen evolution reaction (HER); however, these examinations have utilized synthesized MoS2 because the pristine MoS2 mineral is known to be a poor catalyst. The fundamental challenge with pristine MoS2 is the inert HER activity of the predominant (0001) basal surface plane. In order to achieve high HER performance with pristine MoS2, it is essential to activate the basal plane. Here, we report a general thermal process in which the basal plane is texturized to increase the density of HER-active edge sites. This texturization is achieved through a simple thermal annealing procedure in a hydrogen environment, removing sulfur from the MoS2 surface to form edge sites. As a result, the process generates high HER catalytic performance in pristine MoS2 across various morphologies such as the bulk mineral, films composed of micron-scale flakes, and even films of a commercially available spray of nanoflake MoS2. The lowest overpotential (η) observed for these samples was η = 170 mV to obtain 10 mA/cm(2) of HER current density.

  10. Wasp-waisted magnetism in hydrothermally grown MoS2 nanoflakes

    NASA Astrophysics Data System (ADS)

    Chacko, Levna; Swetha, A. K.; Anjana, R.; Jayaraj, M. K.; Aneesh, P. M.

    2016-11-01

    Two-dimensional semiconducting materials are emanating as a requisite group of materials for future nanoscale electronics and optoelectronics. Particularly, transition-metal dichalcogenides like molybdenum disulphide (MoS2), a semiconducting inorganic counterpart of graphene have intrigued intensive interest as two-dimensional materials due to its novel functionalities. In this work, the utilization of high pressure and low temperature hydrothermal method offers a facile, versatile synthetic tool for MoS2 nanoflakes formation without the addition of any surfactants. Our experimental results resolve the formation of hexagonal phase, well-ordered stacking of S-Mo-S layers, quantum confinement and interlayer interaction. The strong spin-orbit coupling in MoS2 provides enthralling optical and magnetic properties. A large optical absorption in 400-700 nm region and strong luminescence provide evidence for the indirect to direct band gap transition in MoS2. Magnetic measurement results reveal ferromagnetism for all the MoS2 nanoflakes and also indicate an increase in saturation magnetization with increase in duration of growth. In addition, a wasp-waisted hysteresis loop was also observed for the first time in MoS2 nanostructures indicating multimodal population, increased grain growth and MoS2-MoO3 coupling. Our findings provide important insights into the future applications of MoS2 in high-performance nanodevices and spintronics.

  11. A Simple Synthetic Route to MoS2 and WS2 Nanoparticles and Thin Films

    NASA Astrophysics Data System (ADS)

    Lee, G. H.; Jeong, J. W.; Huh, S. H.; Kim, S. H.; Choi, B. J.; Kim, Y. W.

    We produced both MoS2 and WS2 nanoparticles by thermally decomposing M(CO)6 (M = Mo, W) in excess of H2S by using a hot filament. Both highly pure crystalline MoS2 and WS2 nanoparticles were efficiently produced over the filament temperature range from 300 to 800 °C. Particle diameter ranged from 2.0 to 5.0 nm and from 3.0 to 6.0 nm for MoS2 and WS2 nanoparticles, respectively. Fullerene-like particles such as nanotubes, onions, and empty and nested hollows were not produced. Both MoS2 and WS2 nanoparticles have a hexagonal close packed structure. Cell constants are determined to be a = 3.09 and c = 12.61 Å and a = 3.09 and c = 12.47 Å for MoS2 and WS2 nanoparticles, respectively, which are all consistent with the corresponding bulk values. Thin films of MoS2 and WS2 were also prepared by chemical vapor deposition of MoS2 and WS2 on stainless steel disks at 600-650 °C and low friction coefficients were obtained at an ambient atmosphere for both MoS2 and WS2 thin films, implying that they can serve as good solid lubricants.

  12. Re-Engineering the Mission Operations System (MOS) for the Prime and Extended Mission

    NASA Technical Reports Server (NTRS)

    Hunt, Joseph C., Jr.; Cheng, Leo Y.

    2012-01-01

    One of the most challenging tasks in a space science mission is designing the Mission Operations System (MOS). Whereas the focus of the project is getting the spacecraft built and tested for launch, the mission operations engineers must build a system to carry out the science objectives. The completed MOS design is then formally assessed in the many reviews. Once a mission has completed the reviews, the Mission Operation System (MOS) design has been validated to the Functional Requirements and is ready for operations. The design was built based on heritage processes, new technology, and lessons learned from past experience. Furthermore, our operational concepts must be properly mapped to the mission design and science objectives. However, during the course of implementing the science objective in the operations phase after launch, the MOS experiences an evolutional change to adapt for actual performance characteristics. This drives the re-engineering of the MOS, because the MOS includes the flight and ground segments. Using the Spitzer mission as an example we demonstrate how the MOS design evolved for both the prime and extended mission to enhance the overall efficiency for science return. In our re-engineering process, we ensured that no requirements were violated or mission objectives compromised. In most cases, optimized performance across the MOS, including gains in science return as well as savings in the budget profile was achieved. Finally, we suggest a need to better categorize the Operations Phase (Phase E) in the NASA Life-Cycle Phases of Formulation and Implementation

  13. Efficient exfoliation of MoS2 with volatile solvents and their application for humidity sensor. .

    PubMed

    Zhang, Shao-Lin; Jung, Hyun; Huh, Jeung-Soo; Yu, Joon-Boo; Yang, Woo-Chul

    2014-11-01

    Liquid-phase exfoliation is likely to be feasible for practical fabrication of few-layer MoS2 nanosheets in large quantities. However, this method generally involves the organic solvents with high boiling point; new strategy using low-boiling-point solvents to obtain high MoS2 concentration is still highly required. In this study, using the strategy of Hansen solubility parameters (HSP), a method based on exfoliation of MoS2 in chloroform/acetonitrile mixtures is demonstrated to fabricate high concentration MoS2 nanosheet solution. The highest concentration of few-layer MoS2 nanosheets and nanoparticles up to 0.4 mg/ml is achieved with the optimum composition of mixture. The MoS2 nanosheet thin film is also investigated in terms of their sensing properties towards humidity. The exfoliated MoS2 based thin film sensor exhibited excellent sensitivity, quick response and recovery, and good reproducibility comparing to their bulk counterpart. The excellent sensing performance of exfoliated MoS2 is generally attributed to the high surface-to-volume-ratio and increased ratio of edge sites and basal plane sites after exfoliation.

  14. A Confirmatory Factor Analysis of an Abbreviated Social Support Instrument: The MOS-SSS

    ERIC Educational Resources Information Center

    Gjesfjeld, Christopher D.; Greeno, Catherine G.; Kim, Kevin H.

    2008-01-01

    Objective: Confirm the factor structure of the original 18-item Medical Outcome Study Social Support Survey (MOS-SSS) as well as two abbreviated versions in a sample of mothers with a child in mental health treatment. Method: The factor structure, internal consistency, and concurrent validity of the MOS-SSS were assessed using a convenience sample…

  15. DNA base detection using a single-layer MoS2.

    PubMed

    Farimani, Amir Barati; Min, Kyoungmin; Aluru, Narayana R

    2014-08-26

    Nanopore-based DNA sequencing has led to fast and high-resolution recognition and detection of DNA bases. Solid-state and biological nanopores have low signal-to-noise ratio (SNR) (< 10) and are generally too thick (> 5 nm) to be able to read at single-base resolution. A nanopore in graphene, a 2-D material with sub-nanometer thickness, has a SNR of ∼3 under DNA ionic current. In this report, using atomistic and quantum simulations, we find that a single-layer MoS2 is an extraordinary material (with a SNR > 15) for DNA sequencing by two competing technologies (i.e., nanopore and nanochannel). A MoS2 nanopore shows four distinct ionic current signals for single-nucleobase detection with low noise. In addition, a single-layer MoS2 shows a characteristic change/response in the total density of states for each base. The band gap of MoS2 is significantly changed compared to other nanomaterials (e.g., graphene, h-BN, and silicon nanowire) when bases are placed on top of the pristine MoS2 and armchair MoS2 nanoribbon, thus making MoS2 a promising material for base detection via transverse current tunneling measurement. MoS2 nanopore benefits from a craftable pore architecture (combination of Mo and S atoms at the edge) which can be engineered to obtain the optimum sequencing signals.

  16. Graphite-incorporated MoS2 nanotubes: a new coaxial binary system.

    PubMed

    Reza-San German, C; Santiago, P; Ascencio, J A; Pal, U; Pérez-Alvarez, M; Rendón, L; Mendoza, D

    2005-09-22

    Graphite-filled MoS2 nanotubes were synthesized by pyrolizing propylene inside MoS2 nanotubes prepared by a template-assisted technique. The large coaxial nanotubes were constituted of graphite sheets inserted between the MoS2 layers, forming the outer part, and coaxial multiwall carbon nanotubes intercalated with MoS2 inside. High-resolution electron microscopy (HREM) and electron energy loss spectroscopy techniques along with molecular dynamics simulation and quantum mechanical calculations were used to characterize the samples. The one-dimensional structures exhibit diverse morphologies such as long straight and twisted nanotubes with several structural irregularities. The interplanar spacing between the MoS2 layers was found to increase from 6.3 to 7.4 A due to intercalation with carbon. Simulated HREM images revealed the presence of mechanical strains in the carbon-intercalated MoS2 layers as the reason for obtaining these twisted nanostructures. The mechanism of formation of carbon-intercalated MoS2 tubular structures and their stability and electronic properties are discussed. Our results open up the possibility of using MoS2 nanotubes as templates for the synthesis of new one-dimensional binary-phase systems.

  17. Mos1 transposon-based transformation of fish cell lines using baculoviral vectors

    SciTech Connect

    Yokoo, Masako; Fujita, Ryosuke; Nakajima, Yumiko; Yoshimizu, Mamoru; Kasai, Hisae; Asano, Shin-ichiro; Bando, Hisanori

    2013-09-13

    Highlights: •The baculovirus vector infiltrates the cells of economic important fishes. •Drosophila Mos1 transposase expressed in fish cells maintains its ability to localize to the nucleus. •The baculoviral vector carrying Mos1 is a useful tool to stably transform fish cells. -- Abstract: Drosophila Mos1 belongs to the mariner family of transposons, which are one of the most ubiquitous transposons among eukaryotes. We first determined nuclear transportation of the Drosophila Mos1-EGFP fusion protein in fish cell lines because it is required for a function of transposons. We next constructed recombinant baculoviral vectors harboring the Drosophila Mos1 transposon or marker genes located between Mos1 inverted repeats. The infectivity of the recombinant virus to fish cells was assessed by monitoring the expression of a fluorescent protein encoded in the viral genome. We detected transgene expression in CHSE-214, HINAE, and EPC cells, but not in GF or RTG-2 cells. In the co-infection assay of the Mos1-expressing virus and reporter gene-expressing virus, we successfully transformed CHSE-214 and HINAE cells. These results suggest that the combination of a baculovirus and Mos1 transposable element may be a tool for transgenesis in fish cells.

  18. Controllable growth and electrostatic properties of Bernal stacked bilayer MoS2

    NASA Astrophysics Data System (ADS)

    Hao, Song; Yang, Bingchu; Gao, Yongli

    2016-09-01

    Compared with the most studied monolayer MoS2, bilayer MoS2 possesses many distinct fascinating physical properties and potential applications owing to interlayer interactions and structural symmetry. Here, bilayer MoS2 domains with strict identical AB Bernal stacked order were controllably synthesized using chemical vapor deposition method. In addition, the electrostatic properties of bilayer MoS2 were systematically investigated by multiple means of photoemission electron microscopy, electrostatic force microscopy, and kelvin probe force microscopy. We found that the work function of monolayer MoS2 is homogeneous across single crystals and polycrystalline films except for grain boundaries. However, the work function of the Bernal stacked bilayer MoS2 decreases by 50 ± 4 meV compared with that of monolayer MoS2 due to the interlayer coupling and screening effects. The deeper understanding gained here on the electrostatic properties of the AB Bernal stacked bilayer MoS2 should help in the creation of next-generation electronic and optoelectronic devices.

  19. Hierarchical MoS2@RGO nanosheets for high performance sodium storage

    NASA Astrophysics Data System (ADS)

    Che, Zongzhou; Li, Yafeng; Chen, Kaixiang; Wei, Mingdeng

    2016-11-01

    The hierarchical MoS2/carbonaceous materials composites have received considerable interest for electrochemical energy storage and conversion. In the present work, the hierarchical MoS2@RGO nanosheets, where ultrathin MoS2 nanosheets perpendicularly anchor on both sides of RGO, are successfully synthesized by a new route. Such hybrid structures not only improve the conductivity of the hybrid structure and effectively prevent the aggregation of MoS2 nanosheets, but also maximize the MoS2 loading in the MoS2@RGO composites to be over 92%. The formation process for the hierarchical MoS2@RGO nanosheets is also investigated. When evaluated as an anode material for sodium-ion batteries, the hierarchical MoS2@RGO nanosheets deliver an excellent cycling performance and a high specific capacity of 420 mA h g-1 at a current density of 100 mA g-1. The strategy can be used to prepare other hierarchical metal sulfides@RGO nanosheets as high performance anode materials for sodium-ion batteries.

  20. Hall and Nernst effects in monolayer MoS2

    NASA Astrophysics Data System (ADS)

    Zhang, Yun-Hai; Zhang, Ming-Hua

    2016-03-01

    We study Hall and Nernst transports in monolayer MoS2 based on Green’s function formalism. We have derived analytical results for spin and valley Hall conductivities in the zero temperature and spin and valley Nernst conductivities in the low temperature. We found that tuning of the band gap and spin-orbit splitting can drive system transition from spin Hall insulator (SHI) to valley Hall insulator (VHI). When the system is subjected to a temperature gradient, the spin and valley Nernst conductivities are dependent on Berry curvature.

  1. DAG Telescope: A New Potential for MOS Observations

    NASA Astrophysics Data System (ADS)

    Alis, S.; Yesilyaprak, C.; Yerli, S. K.

    2016-10-01

    East Anatolian Observatory (aka. DAG) is a national project supported by the Turkish Government for building a 4 m class telescope which will be working in the optical and near-IR domain. As the tender process has been completed and kick-off to the telescope and the mirror production has been initiated, the project team is looking for possible collaborations for the focal plane instrumentation. This contribution is intended to describe the DAG project and to show its opportunities for a state-of-the-art MOS instrument.

  2. Word Frequency Analysis. MOS: 93J. Skill Levels 1 & 2

    DTIC Science & Technology

    1981-05-01

    ETI.A 3 W40 A I’tto -I HE1614 j cIci tI I SIGiT I HIGLY...ll_ __ -------- 116 MOS WOqo i.ISTINGIASCcNOIt$ SEQUENC ~E DATE 81167 1635 PAGE 6 - UI it...31 I1,S’i I 25514.. A I i UE V 3 SS.IINI 3’. IT 13 T~’ - 14 ITS1 %6 e1. -ms. "ý0 Sz1:crIo4 __ 1 K(C 4 V i ~~i:i*G I ~1LUCYCLL 2 klir.inTLAS 1 _ K1NV 4

  3. Word Frequency Analysis. MOS: 82C. Skill Levels 1 & 2.

    DTIC Science & Technology

    1981-05-01

    Army Soldier’s Manual for the MOS/Skill Level designated in the title (item 4). This frequency count reflects only skill levels ]IlI and excludes the... WESIT 7 111r. KIAE4, 6 ArIIIST FC 6 AFIF- f~r ’AI AA AKVt~ A C PSIAI KT 1. MI14 f Al CKtlI f. 901110 r VI III INY 0- tw II 1, 1s 111lt~,0171 A cririI-’L A

  4. Effects of surface potential fluctuations on DLTS of MOS structure

    NASA Astrophysics Data System (ADS)

    Özder, Serhat; Atilgan, İsmai˙l.; Katircioǧlu, Bayram

    1996-02-01

    Although the conventional large signal deep-level transient spectroscopy (DLTS) technique is immune to surface potential fluctuations resulting from interface charge inhomogeneities in a MOS structure, in energy resolved, small signal DLTS, the eventual surface potential fluctuation should be considered. In this paper, the effect of the potential fluctuation on the temperature-scan DLTS signal for a given gate bias has been carried out. In fact, this effect shifts the DLTS peak position to lower temperatures and decreases the peak amplitude, leading to an apparent energy position and lower Dit values, respectively.

  5. MOS structures based on epitaxial HgCdTe layers

    SciTech Connect

    Antonov, V.V.; Belashov, Y.G.; Kazak, E.P.; Mezentseva, M.P.; Voitsekhovskii, A.V.

    1985-08-01

    The authors present the results of a study of the dependence of the surface photoelectromotive force at wavelengths of 3.39 and 10.6 micrometers on the field electrode for MOS structures prepared from epitaxial Hg /SUB 1-x/ Cd /SUB x/ Te layers (x=0.20-0.25). They analyze the nature of the inhomogeneities in the region near the surface of semiconducting samples prepared under various heat treatment conditions and present their findings in a series of three charts.

  6. Single-poly EEPROM cell with lightly doped MOS capacitors

    DOEpatents

    Riekels, James E.; Lucking, Thomas B.; Larsen, Bradley J.; Gardner, Gary R.

    2008-05-27

    An Electrically Erasable Programmable Read Only Memory (EEPROM) memory cell and a method of operation are disclosed for creating an EEPROM memory cell in a standard CMOS process. A single polysilicon layer is used in combination with lightly doped MOS capacitors. The lightly doped capacitors employed in the EEPROM memory cell can be asymmetrical in design. Asymmetrical capacitors reduce area. Further capacitance variation caused by inversion can also be reduced by using multiple control capacitors. In addition, the use of multiple tunneling capacitors provides the benefit of customized tunneling paths.

  7. Layer-by-layer self-assembly of polyelectrolyte functionalized MoS2 nanosheets

    NASA Astrophysics Data System (ADS)

    Shen, Jianfeng; Pei, Yu; Dong, Pei; Ji, Jin; Cui, Zheng; Yuan, Junhua; Baines, Robert; Ajayan, Pulickel M.; Ye, Mingxin

    2016-05-01

    Few-layered polyelectrolyte functionalized MoS2 nanosheets were obtained for the first time through in situ polymerization of MoS2 nanosheets with poly(acrylic acid) and poly(acrylamide), both of which demonstrated excellent dispersibility and stability in water. After designing and optimizing the components of this series of polyelectrolyte functionalized MoS2 nanosheets, by exploiting the electrostatic interactions present in the modified MoS2 nanosheets, we further created a series of layer-by-layer (LBL) self-assembling MoS2-based films. To this end, uniform MoS2 nanosheet-based LBL films were precisely deposited on substrates such as quartz, silicon, and ITO. The polyelectrolyte functionalized MoS2 nanosheet assembled LBL film-modified electrodes demonstrated enhanced electrocatalytic activity for H2O2. As such, they are conducive to efficient sensors and advanced biosensing systems.Few-layered polyelectrolyte functionalized MoS2 nanosheets were obtained for the first time through in situ polymerization of MoS2 nanosheets with poly(acrylic acid) and poly(acrylamide), both of which demonstrated excellent dispersibility and stability in water. After designing and optimizing the components of this series of polyelectrolyte functionalized MoS2 nanosheets, by exploiting the electrostatic interactions present in the modified MoS2 nanosheets, we further created a series of layer-by-layer (LBL) self-assembling MoS2-based films. To this end, uniform MoS2 nanosheet-based LBL films were precisely deposited on substrates such as quartz, silicon, and ITO. The polyelectrolyte functionalized MoS2 nanosheet assembled LBL film-modified electrodes demonstrated enhanced electrocatalytic activity for H2O2. As such, they are conducive to efficient sensors and advanced biosensing systems. Electronic supplementary information (ESI) available: SEM, AFM and TEM characterization of PAA-MoS2 and PAM-MoS2 nanocomposites. More characterization and electrochemical properties of LBL films

  8. Dual role of blue luminescent MoS2 quantum dots in fluorescence resonance energy transfer phenomenon.

    PubMed

    Ha, Hyun Dong; Han, Dong Ju; Choi, Jong Seob; Park, Minsu; Seo, Tae Seok

    2014-10-15

    Homogeneous blue luminescent MoS2 quantum dots are fabricated by using a lithium intercalation method from MoS2 nanoparticles, and the unique blue photoluminescence property is utilized in the Alexa Fluor 430-dsDNA-MoS2 FRET system, demonstrating the dual function of MoS2 quantum dots as a donor and an acceptor.

  9. MoS2 Nanosheet-Pd Nanoparticle Composite for Highly Sensitive Room Temperature Detection of Hydrogen.

    PubMed

    Kuru, Cihan; Choi, Chulmin; Kargar, Alireza; Choi, Duyoung; Kim, Young Jin; Liu, Chin Hung; Yavuz, Serdar; Jin, Sungho

    2015-04-01

    Highly sensitive hydrogen detection at room temperature can be realized by employing solution-processed MoS2 nanosheet-Pd nanoparticle composite. A MoS2-Pd composite exhibits greater sensing performance than its graphene counterpart, indicating that solvent exfoliated MoS2 holds great promise for inexpensive and scalable fabrication of highly sensitive chemical sensors.

  10. Defects Engineered Monolayer MoS2 for Improved Hydrogen Evolution Reaction.

    PubMed

    Ye, Gonglan; Gong, Yongji; Lin, Junhao; Li, Bo; He, Yongmin; Pantelides, Sokrates T; Zhou, Wu; Vajtai, Robert; Ajayan, Pulickel M

    2016-02-10

    MoS2 is a promising and low-cost material for electrochemical hydrogen production due to its high activity and stability during the reaction. However, the efficiency of hydrogen production is limited by the amount of active sites, for example, edges, in MoS2. Here, we demonstrate that oxygen plasma exposure and hydrogen treatment on pristine monolayer MoS2 could introduce more active sites via the formation of defects within the monolayer, leading to a high density of exposed edges and a significant improvement of the hydrogen evolution activity. These as-fabricated defects are characterized at the scale from macroscopic continuum to discrete atoms. Our work represents a facile method to increase the hydrogen production in electrochemical reaction of MoS2 via defect engineering, and helps to understand the catalytic properties of MoS2.

  11. MoS2‐Based Nanocomposites for Electrochemical Energy Storage

    PubMed Central

    Wang, Tianyi; Chen, Shuangqiang; Xue, Huaiguo

    2016-01-01

    Typical layered transition‐metal chalcogenide materials, in particular layered molybdenum disulfide (MoS2) nanocomposites, have attracted increasing attention in recent years due to their excellent chemical and physical properties in various research fieldsHere, a general overview of synthetic MoS2 based nanocomposites via different preparation approaches and their applications in energy storage devices (Li‐ion battery, Na‐ion battery, and supercapacitor) is presented. The relationship between morphologies and the electrochemical performances of MoS2‐based nanocomposites in the three typical and promising rechargeable systems is also discussed. Finally, perspectives on major challenges and opportunities faced by MoS2‐based materials to address the practical problems of MoS2‐based materials are presented. PMID:28251051

  12. Photocurrent Switching of Monolayer MoS2 Using a Metal-Insulator Transition.

    PubMed

    Lee, Jin Hee; Gul, Hamza Zad; Kim, Hyun; Moon, Byoung Hee; Adhikari, Subash; Kim, Jung Ho; Choi, Homin; Lee, Young Hee; Lim, Seong Chu

    2017-02-08

    We achieve switching on/off the photocurrent of monolayer molybdenum disulfide (MoS2) by controlling the metal-insulator transition (MIT). N-type semiconducting MoS2 under a large negative gate bias generates a photocurrent attributed to the increase of excess carriers in the conduction band by optical excitation. However, under a large positive gate bias, a phase shift from semiconducting to metallic MoS2 is caused, and the photocurrent by excess carriers in the conduction band induced by the laser disappears due to enhanced electron-electron scattering. Thus, no photocurrent is detected in metallic MoS2. Our results indicate that the photocurrent of MoS2 can be switched on/off by appropriately controlling the MIT transition by means of gate bias.

  13. 3D MoS2-graphene hybrid aerogels as catalyst for enhanced efficient hydrogen evolution

    NASA Astrophysics Data System (ADS)

    Xu, Xiaobing; Sun, Yuan; Qiao, Wen; Zhang, Xing; Chen, Xing; Song, Xueyin; Wu, Liqian; Zhong, Wei; Du, Youwei

    2017-02-01

    Aerogel composite materials consisting of MoS2 and reduced graphite oxide (rGO) are synthesized by a facile general hydrothermal method, where GO is utilized as a template and provides a novel substrate for the nucleation and subsequent growth of MoS2. These MoS2/rGO hybrid nanostructures exhibit three-dimensional (3D) leaf-like morphology, and show excellent electrocatalytic activities of hydrogen evolution reaction (HER), with a low overpotential of approximately 105 mV, a small Tafel slope of 51 mV/dec and a large exchange current density (j0) of 3.28 × 10-5 A/cm2. The superior electrochemical performance should be attributed to the 3D porous MoS2/rGO hybrid architecture, which enhances the conductivity from graphene to MoS2 as well as the HER activity.

  14. Simultaneous self-exfoliation and autonomous motion of MoS2 particles in water.

    PubMed

    Wang, Hong; Sofer, Zdenek; Moo, James Guo Sheng; Pumera, Martin

    2015-06-18

    Two-dimensional (2D) transitional metal dichalcogenides (TMDCs) have been receiving significant research interest due to their unique physical and electronic properties. We report the design of a MoS2 based motor that can display simultaneous self-exfoliation and autonomous motion at the surface of water. Exfoliation of bulk MoS2via sodium intercalation offers an attractive way to obtain solution-phase 2D MoS2 nanosheets on a large scale. The motion of the MoS2 particles results from the surface tension gradients generated by the naphthalene distributed in the MoS2 particles. A combination of self-exfoliation and propulsion in an unmodified water environment hence leads to a new platform which holds great promise for new applications of TMDC materials in small scale motors.

  15. Reconfigurable Complementary Logic Circuits with Ambipolar Organic Transistors

    PubMed Central

    Yoo, Hocheon; Ghittorelli, Matteo; Smits, Edsger C. P.; Gelinck, Gerwin H.; Lee, Han-Koo; Torricelli, Fabrizio; Kim, Jae-Joon

    2016-01-01

    Ambipolar organic electronics offer great potential for simple and low-cost fabrication of complementary logic circuits on large-area and mechanically flexible substrates. Ambipolar transistors are ideal candidates for the simple and low-cost development of complementary logic circuits since they can operate as n-type and p-type transistors. Nevertheless, the experimental demonstration of ambipolar organic complementary circuits is limited to inverters. The control of the transistor polarity is crucial for proper circuit operation. Novel gating techniques enable to control the transistor polarity but result in dramatically reduced performances. Here we show high-performance non-planar ambipolar organic transistors with electrical control of the polarity and orders of magnitude higher performances with respect to state-of-art split-gate ambipolar transistors. Electrically reconfigurable complementary logic gates based on ambipolar organic transistors are experimentally demonstrated, thus opening up new opportunities for ambipolar organic complementary electronics. PMID:27762321

  16. Transistor-based particle detection systems and methods

    SciTech Connect

    Jain, Ankit; Nair, Pradeep R.; Alam, Muhammad Ashraful

    2015-06-09

    Transistor-based particle detection systems and methods may be configured to detect charged and non-charged particles. Such systems may include a supporting structure contacting a gate of a transistor and separating the gate from a dielectric of the transistor, and the transistor may have a near pull-in bias and a sub-threshold region bias to facilitate particle detection. The transistor may be configured to change current flow through the transistor in response to a change in stiffness of the gate caused by securing of a particle to the gate, and the transistor-based particle detection system may configured to detect the non-charged particle at least from the change in current flow.

  17. Utilizing nonlinearity of transistors for reconfigurable chaos computation

    NASA Astrophysics Data System (ADS)

    Ditto, William; Kia, Behnam

    2014-03-01

    A VLSI circuit design for chaos computing is presented that exploits the intrinsic nonlinearity of transistors to implement a novel approach for conventional and chaotic computing circuit design. In conventional digital circuit design and implementation, transistors are simply switched on or off. We argue that by using the full range of nonlinear dynamics of transistors, we can design and build more efficient computational elements and logic blocks. Furthermore, the nonlinearity of these transistor circuits can be used to program the logic block to implement different types of computational elements that can be reconfigured. Because the intrinsic nonlinear dynamics of the transistors are utilized the resulting circuits typically require fewer transistors compared to conventional digital circuits as we exploit the intrinsic nonlinearity of the transistors to realize computations. This work was done with support from ONR grant N00014-12-1-0026 and from an ONR STTR and First Pass Engineering.

  18. Atomically Thin-Layered Molybdenum Disulfide (MoS2) for Bulk-Heterojunction Solar Cells.

    PubMed

    Singh, Eric; Kim, Ki Seok; Yeom, Geun Young; Nalwa, Hari Singh

    2017-02-01

    Transition metal dichalcogenides (TMDs) are becoming significant because of their interesting semiconducting and photonic properties. In particular, TMDs such as molybdenum disulfide (MoS2), molybdenum diselenide (MoSe2), tungsten disulfide (WS2), tungsten diselenide (WSe2), titanium disulfide (TiS2), tantalum sulfide (TaS2), and niobium selenide (NbSe2) are increasingly attracting attention for their applications in solar cell devices. In this review, we give a brief introduction to TMDs with a focus on MoS2; and thereafter, emphasize the role of atomically thin MoS2 layers in fabricating solar cell devices, including bulk-heterojunction, organic, and perovskites-based solar cells. Layered MoS2 has been used as the hole-transport layer (HTL), electron-transport layer (ETL), interfacial layer, and protective layer in fabricating heterojunction solar cells. The trilayer graphene/MoS2/n-Si solar cell devices exhibit a power-conversion efficiency of 11.1%. The effects of plasma and chemical doping on the photovoltaic performance of MoS2 solar cells have been analyzed. After doping and electrical gating, a power-conversion efficiency (PCE) of 9.03% has been observed for the MoS2/h-BN/GaAs heterostructure solar cells. The MoS2-containing perovskites-based solar cells show a PCE as high as 13.3%. The PCE of MoS2-based organic solar cells exceeds 8.40%. The stability of MoS2 solar cells measured under ambient conditions and light illumination has been discussed. The MoS2-based materials show a great potential for solar cell devices along with high PCE; however, in this connection, their long-term environmental stability is also of equal importance for commercial applications.

  19. Laser-Induced Particle Adsorption on Atomically Thin MoS2.

    PubMed

    Tran Khac, Bien Cuong; Jeon, Ki-Joon; Choi, Seung Tae; Kim, Yong Soo; DelRio, Frank W; Chung, Koo-Hyun

    2016-02-10

    Atomically thin molybdenum disulfide (MoS2) shows great potential for use in nanodevices because of its remarkable electronic, optoelectronic, and mechanical properties. These material properties are often dependent on the thickness or the number of layers, and hence Raman spectroscopy is widely used to characterize the thickness of atomically thin MoS2 due to the sensitivity of the vibrational spectrum to thickness. However, the lasers used in Raman spectroscopy can increase the local surface temperature and eventually damage the upper layers of the MoS2, thereby changing the aforementioned material properties. In this work, the effects of lasers on the topography and material properties of atomically thin MoS2 were systematically investigated using Raman spectroscopy and atomic force microscopy. In detail, friction force microscopy was used to study the friction characteristics of atomically thin MoS2 as a function of laser powers from 0.5 to 20 mW and number of layers from 1 to 3. It was found that particles formed on the top surface of the atomically thin MoS2 due to laser-induced thermal effects. The degree of particle formation increased as the laser power increased, prior to the thinning of the atomically thin MoS2. In addition, the degree of particle formation increased as the number of MoS2 layers increased, which suggests that the thermal behavior of the supported MoS2 may differ depending on the number of layers. The particles likely originated from the atmosphere due to laser-induced heating, but could be eliminated via appropriate laser powers and exposure times, which were determined experimentally. The outcomes of this work indicate that thermal management is crucial in the design of reliable nanoscale devices based on atomically thin MoS2.

  20. The light-sensitive MNOS memory transistor.

    NASA Technical Reports Server (NTRS)

    Sewell, F. A., Jr.

    1973-01-01

    The behavior theory of the light-sensitive MNOS memory transistor is developed and supported by presented experimental evidence. It is shown that the nitride, oxide, and silicon space-charge current-field relationships necessary for comparison of theory and experiment can be obtained from steady-state current-voltage measurements on the MNOS device.

  1. Self-oscillating inverter with bipolar transistors

    NASA Astrophysics Data System (ADS)

    Baciu, I.; Cunţan, C. D.; Floruţa, M.

    2016-02-01

    The paper presents a self-oscillating inverter manufactured with bipolar transistors that supplies a high-amplitude alternating voltage to a fluorescent tube with a burned filament. The inverter is supplied from a low voltage accumulator that can be charged from a photovoltaic panel through a voltage regulator.

  2. Gallium nitride junction field-effect transistor

    DOEpatents

    Zolper, John C.; Shul, Randy J.

    1999-01-01

    An all-ion implanted gallium-nitride (GaN) junction field-effect transistor (JFET) and method of making the same. Also disclosed are various ion implants, both n- and p-type, together with or without phosphorous co-implantation, in selected III-V semiconductor materials.

  3. Gallium nitride junction field-effect transistor

    DOEpatents

    Zolper, J.C.; Shul, R.J.

    1999-02-02

    An ion implanted gallium-nitride (GaN) junction field-effect transistor (JFET) and method of making the same are disclosed. Also disclosed are various ion implants, both n- and p-type, together with or without phosphorus co-implantation, in selected III-V semiconductor materials. 19 figs.

  4. Radiation Damage In Advanced Bipolar Transistors

    NASA Technical Reports Server (NTRS)

    Zoutendyk, John A.; Goben, Charles A.; Berndt, Dale F.

    1989-01-01

    Report describes measurements of common-emitter current gains (hFE) of advanced bipolar silicon transistors before, during, and after irradiation with 275-MeV bromine ions, 2.5-MeV electrons, and conductivity rays from cobalt-60 atoms.

  5. Graphene-porphyrin single-molecule transistors.

    PubMed

    Mol, Jan A; Lau, Chit Siong; Lewis, Wilfred J M; Sadeghi, Hatef; Roche, Cecile; Cnossen, Arjen; Warner, Jamie H; Lambert, Colin J; Anderson, Harry L; Briggs, G Andrew D

    2015-08-21

    We demonstrate a robust graphene-molecule-graphene transistor architecture. We observe remarkably reproducible single electron charging, which we attribute to insensitivity of the molecular junction to the atomic configuration of the graphene electrodes. The stability of the graphene electrodes allow for high-bias transport spectroscopy and the observation of multiple redox states at room-temperature.

  6. Radiation Tolerance of 65nm CMOS Transistors

    DOE PAGES

    Krohn, M.; Bentele, B.; Christian, D. C.; ...

    2015-12-11

    We report on the effects of ionizing radiation on 65 nm CMOS transistors held at approximately -20°C during irradiation. The pattern of damage observed after a total dose of 1 Grad is similar to damage reported in room temperature exposures, but we observe less damage than was observed at room temperature.

  7. MEGARA, the new IFU and MOS for the GTC

    NASA Astrophysics Data System (ADS)

    Gil de Paz, A.; Gallego, J.; Carrasco, E.; Iglesias-Páramo, J.; Sánchez Moreno, F. M.; Vílchez, J. M.; García Vargas, M. L.; Arrillaga, X.; Carrera, M. A.; Castillo-Morales, A.; Castillo-Domínguez, E.; Cedazo, R.; Eliche-Moral, M. C.; Ferrusca, D.; González-Guardia, E.; Lefort, B.; Maldonado, M.; Marino, R. A.; Martínez-Delgado, I.; Morales Durán, I.; Mujica, E.; Páez, G.; Pascual, S.; Pérez-Calpena, A.; Sánchez-Penim, A.; Sánchez-Blanco, E.; Tulloch, S.; Velázquez, M.; Zamorano, J.; Aguerri, A. L.; Barrado y Naváscues, D.; Bertone, E.; Cardiel, N.; Cava, A.; Cenarro, J.; Chávez, M.; García, M.; Guichard, J.; Guzmán, R.; Herrero, A.; Huélamo, N., Hughes, D.; Jiménez-Vicente, J.; Kehrig, C.; Márquez, I.; Masegosa, J.; Mayya, Y. D.; Méndez-Abreu, J.; Mollá, M.; Muñoz-Tuñón, C.; Peimbert, M.; Pérez-González, P. G.; Pérez Montero, E.; Rodríguez, M.; Rodríguez-Espinosa, J. M.; Rodríguez-Merino, L.; Rosa-González, D.; Sánchez-Almeida, J.; Sánchez Contreras, C.; Sánchez-Blázquez, P.; Sánchez, S. F.; Sarajedini, A.; Silich, S.; Simón-Díaz, S.; Tenorio-Tagle, G.; Terlevich, E.; Terlevich, R.; Torres-Peimbert, S.; Trujillo, I.; Tsamis, Y.; Vega, O.; Villar, V.

    2015-05-01

    MEGARA (Multi-Espectrógrafo en GTC de Alta Resolución para Astronomía) is the future intermediate-resolution optical Integral-Field Unit (IFU) and Multi-Object Spectrograph (MOS) of the 10.4m GTC telescope. The instrument can be used to observe either a contiguous (100% filling factor) field-of-view of 12.5×11.3 arcsec^{2} or 92 objects anywhere in a 3.5×3.5 arcmin^{2} field patrolled by robotic actuactors attached to optical-fiber minibundles, respectively in its IFU and MOS modes. The MEGARA Consortium is led by the Universidad Complutense de Madrid (UCM, Spain) and also includes the Instituto Nacional de Astrofísica, óptica y Electrónica (INAOE, Mexico), the Instituto de Astrofísica de Andalucía (IAA-CSIC, Spain) and the Universidad Politécnica de Madrid (UPM, Spain). The instrument passed its Critical Design Review (CDR) on late 2014 and is currently in construction phase with a planned date for the start of operations at GTC on early 2017. In this paper we summarize the main characteristics of the instrument and the status of the project.

  8. Additional electric field in real trench MOS barrier Schottky diode

    NASA Astrophysics Data System (ADS)

    Mamedov, R. K.; Aslanova, A. R.

    2016-04-01

    In real trench MOS barrier Schottky diode (TMBS diode) additional electric field (AEF) the whole is formed in the near contact region of the semiconductor and its propagation space is limited with the barrier metal and the metallic electrodes of MOS structures. Effective potential barrier height TMBS diode is formed via resulting electric field of superposition AEF and electric field of space charge region (SCR) semiconductor. The dependence of the resulting electric field intensity of the distance towards the inside the semiconductor is nonlinear and characterized by a peak at a certain distance from the interface. The thickness of the SCR in TMBS diode becomes equal to the trench depth. Force and energy parameters of the AEF, and thus resulting electric field in the SCR region, become dependent on the geometric design parameters TMBS diode. The forward I-V characteristic TMBS diode is described by the thermionic emission theory as in conventional flat Scottky diode, and in the reverse bias, current is virtually absent at initial voltage, appears abruptly at a certain critical voltage.

  9. Identification of single nucleotides in MoS2 nanopores

    NASA Astrophysics Data System (ADS)

    Feng, Jiandong; Liu, Ke; Bulushev, Roman D.; Khlybov, Sergey; Dumcenco, Dumitru; Kis, Andras; Radenovic, Aleksandra

    2015-12-01

    The size of the sensing region in solid-state nanopores is determined by the size of the pore and the thickness of the pore membrane, so ultrathin membranes such as graphene and single-layer molybdenum disulphide could potentially offer the necessary spatial resolution for nanopore DNA sequencing. However, the fast translocation speeds (3,000-50,000 nt ms-1) of DNA molecules moving across such membranes limit their usability. Here, we show that a viscosity gradient system based on room-temperature ionic liquids can be used to control the dynamics of DNA translocation through MoS2 nanopores. The approach can be used to statistically detect all four types of nucleotide, which are identified according to current signatures recorded during their transient residence in the narrow orifice of the atomically thin MoS2 nanopore. Our technique, which exploits the high viscosity of room-temperature ionic liquids, provides optimal single nucleotide translocation speeds for DNA sequencing, while maintaining a signal-to-noise ratio higher than 10.

  10. Fracture in MoS2 Solid Lubricant Films

    SciTech Connect

    Hilton, M.R.

    1995-09-01

    The fracture properties of sputter-deposited films of MoS2 as a function of the additive-controlled microstructure were assessed using brale indentation contact and scanning electron microscopy (SEM). Additives were incorporated as either co-sputtered species (Ni, SbO(x)) or as multilayers (Au-20%Pd, Ni). Undoped films were also examined as references. The undoped films and 3% co-sputtered Ni films (deposited at 2.66 Pa argon background pressure) showed zone 2 columnar plate morphologies with porosity. Co-sputtered films having higher concentrations of Ni or SbO(x) showed zone 1 dense cauliflower morphologies, while the multilayer films (and pure MoS2 films deposited at 0.266 Pa) exhibited dense, featureless morphologies. The porous zone 2 films generally resisted delamination better than the denser morphologies. High Ni concentrations increased spallation. The presence of SbO(x) affected fracture propagation and appeared to be more benign than Ni. The presence of multilayers also affected fracture and retarded spallation in dense microstructures. However, many multilayer structures showed significant delamination.

  11. MOS Mapping of the NIR Outflow HH 223

    NASA Astrophysics Data System (ADS)

    López, R.; Acosta-Pulido, J. A.; Estalella, R.; Gómez, G.; García-Lorenzo, B.

    2016-10-01

    The Multi-Object-Spectroscopy (MOS) mode of LIRIS was used to map the near-IR stellar outflow HH 223, in the dark cloud Lynds 723 (L723). HH 223 spatially coincides with the east-west component of the L723 quadrupolar CO outflow. The radio continuum source SMA2, towards the center of the quadrupolar CO outflow, hides the YSO that seems to power both the near-IR and the CO outflows. To map the S-shaped, near-IR emission of HH 223, extending ˜ 5', an appropriate mask was designed, with 16 rectangular slitlets. J, H and K-band spectra (R ˜eq 2500) were obtained through the mask. The kinematics of the neutral (H2) and ionized ([FeII]) gas outflow was derived from these data. The results confirm that both the near-IR and the CO outflows have a common driving source. To our knowledge, this is the first use of the MOS-LIRIS observing mode with the mask designed ad hoc to fit several extended, nonaligned targets.

  12. Large-area MoS2 deposition via MOVPE

    NASA Astrophysics Data System (ADS)

    Marx, M.; Nordmann, S.; Knoch, J.; Franzen, C.; Stampfer, C.; Andrzejewski, D.; Kümmell, T.; Bacher, G.; Heuken, M.; Kalisch, H.; Vescan, A.

    2017-04-01

    The direct deposition of the 2D transition metal dichalcogenide MoS2 via metal-organic vapour phase epitaxy (MOVPE) is investigated. Growth is performed in a commercial AIXTRON horizontal hot-wall reactor. Molybdenum hexacarbonyl (MCO) and Di-tert-butyl sulfide (DTBS) are used as metal-organic precursors for molybdenum and sulfur, respectively. The successful deposition of MoS2 is demonstrated via Raman spectroscopy on various substrates such as sapphire and Si as well as AlN and GaN templates. The influence of growth time on the evolution of layer morphology is investigated. Variation of carrier gas reveals that a pure nitrogen growth atmosphere and a growth temperature of 750 °C improve layer quality. Additionally, a post-deposition annealing process of the grown samples is examined. It is shown that annealing in a pure nitrogen atmosphere at temperatures between 650 °C and 750 °C strongly increases the Raman intensities.

  13. Near-infrared IFU and MOS observations of supernova remnants

    NASA Astrophysics Data System (ADS)

    Lee, Ho-Gyu

    2016-06-01

    We present near-infrared IFU and MOS observations of two bright [Fe II] line emitting supernova remnants (SNRs). The two SNRs, G11.2-0.3 and RCW103, are selected from our near-infrared [Fe II] 1.64 um narrow band imaging survey of SNRs such as UKIRT unbiased [Fe II] imaging survey of the the Galactic plane and AAT [Fe II] imaging of some core-collapse SNRs. We detect several near-infrared hyperfine lines of [Fe II] at the southeastern shell of G11.2-0.3. We estimate the line strength and extinction-corrected density, which gives a clue to the origin of the iron-rich southeastern shell of G11.2-0.3. We obtain the MOS spectra of [Fe II]-emitting clumps inside RCW103. The observed clumps move about hundreds kilometers in radial direction, suggesting that they are shocked dense materials lost by stellar wind at the final stage of the evolution of the progenitor star.

  14. MoS2 memristor with photoresistive switching

    PubMed Central

    Wang, Wei; Panin, Gennady N.; Fu, Xiao; Zhang, Lei; Ilanchezhiyan, P.; Pelenovich, Vasiliy O.; Fu, Dejun; Kang, Tae Won

    2016-01-01

    A MoS2 nanosphere memristor with lateral gold electrodes was found to show photoresistive switching. The new device can be controlled by the polarization of nanospheres, which causes resistance switching in an electric field in the dark or under white light illumination. The polarization charge allows to change the switching voltage of the photomemristor, providing its multi-level operation. The device, polarized at a voltage 6 V, switches abruptly from a high resistance state (HRSL6) to a low resistance state (LRSL6) with the On/Off resistance ratio of about 10 under white light and smooth in the dark. Analysis of device conductivity in different resistive states indicates that its resistive state could be changed by the modulation of the charge in an electric field in the dark or under light, resulting in the formation/disruption of filaments with high conductivity. A MoS2 photomemristor has great potential as a multifunctional device designed by using cost-effective fabrication techniques. PMID:27492593

  15. Tuning Coupling Behavior of Stacked Heterostructures Based on MoS2, WS2, and WSe2

    PubMed Central

    Wang, Fang; Wang, Junyong; Guo, Shuang; Zhang, Jinzhong; Hu, Zhigao; Chu, Junhao

    2017-01-01

    The interlayer interaction of vertically stacked heterojunctions is very sensitive to the interlayer spacing, which will affect the coupling between the monolayers and allow band structure modulation. Here, with the aid of density functional theory (DFT) calculations, an interesting phenomenon is found that MoS2-WS2, MoS2-WSe2, and WS2-WSe2 heterostructures turn into direct-gap semiconductors from indirect-gap semiconductors with increasing the interlayer space. Moreover, the electronic structure changing process with interlayer spacing of MoS2-WS2, MoS2-WSe2, and WS2-WSe2 is different from each other. With the help of variable-temperature spectral experiment, different electronic transition properties of MoS2-WS2, MoS2-WSe2, and WS2-WSe2 have been demonstrated. The transition transformation from indirect to direct can be only observed in the MoS2-WS2 heterostructure, as the valence band maximum (VBM) at the Γ point in the MoS2-WSe2 and WS2-WSe2 heterostructure is less sensitive to the interlayer spacing than those from the MoS2-WS2 heterostructure. The present work highlights the significance of the temperature tuning in interlayer coupling and advance the research of MoS2-WS2, MoS2-WSe2, and WS2-WSe2 based device applications. PMID:28303932

  16. Tuning Coupling Behavior of Stacked Heterostructures Based on MoS2, WS2, and WSe2

    NASA Astrophysics Data System (ADS)

    Wang, Fang; Wang, Junyong; Guo, Shuang; Zhang, Jinzhong; Hu, Zhigao; Chu, Junhao

    2017-03-01

    The interlayer interaction of vertically stacked heterojunctions is very sensitive to the interlayer spacing, which will affect the coupling between the monolayers and allow band structure modulation. Here, with the aid of density functional theory (DFT) calculations, an interesting phenomenon is found that MoS2-WS2, MoS2-WSe2, and WS2-WSe2 heterostructures turn into direct-gap semiconductors from indirect-gap semiconductors with increasing the interlayer space. Moreover, the electronic structure changing process with interlayer spacing of MoS2-WS2, MoS2-WSe2, and WS2-WSe2 is different from each other. With the help of variable-temperature spectral experiment, different electronic transition properties of MoS2-WS2, MoS2-WSe2, and WS2-WSe2 have been demonstrated. The transition transformation from indirect to direct can be only observed in the MoS2-WS2 heterostructure, as the valence band maximum (VBM) at the Γ point in the MoS2-WSe2 and WS2-WSe2 heterostructure is less sensitive to the interlayer spacing than those from the MoS2-WS2 heterostructure. The present work highlights the significance of the temperature tuning in interlayer coupling and advance the research of MoS2-WS2, MoS2-WSe2, and WS2-WSe2 based device applications.

  17. Biologically active mutants with deletions in the v-mos oncogene assayed with retroviral vectors.

    PubMed Central

    Bold, R J; Donoghue, D J

    1985-01-01

    We have constructed retroviral expression vectors by manipulation of the Moloney murine leukemia virus genome such that an exogenous DNA sequence may be inserted and subsequently expressed when introduced into mammalian cells. A series of N-terminal deletions of the v-mos oncogene was constructed and assayed for biological activity with these retroviral expression vectors. The results of the deletion analysis demonstrate that the region of p37mos coding region upstream of the third methionine codon is dispensable with respect to transformation. However, deletion mutants of v-mos which allow initiation of translation at the fourth methionine codon have lost the biological activity of the parental v-mos gene. Furthermore, experiments were also carried out to define the C-terminal limit of the active region of p37mos by the construction of premature termination mutants by the insertion of a termination oligonucleotide. Insertion of the oligonucleotide just 69 base pairs upstream from the wild-type termination site abolished the focus-forming ability of v-mos. Thus, we have shown the N-terminal limit of the active region of p37mos to be between the third and fourth methionines, while the C-terminal limit is within the last 23 amino acids of the protein. PMID:3018503

  18. Layer-controlled precise fabrication of ultrathin MoS2 films by atomic layer deposition.

    PubMed

    Liu, Lei; Huang, Yazhou; Sha, Jingjie; Chen, Yunfei

    2017-03-21

    Monolayer and/or atomically thin transition metal dichalcogenides cover a wide range of two-dimensional (2-D) materials, whose fascinating semiconducting and optical properties have made them being promising candidate materials for optoelectronic device. Controllable growth of these materials is critical for their device applications. By using MoCl5 and H2S as precursors, monolayer and ultrathin molybdenum disulfide (MoS2) films with controlled lamellar structure have been directly built layer by layer on SiO2 substrates without followed high-temperature annealing. Furthermore, the thickness of MoS2 films can be precisely regulated by applying different ALD cycles. Once an ALD cycle is applied, one molecular layer of MoS2 material will be "added" on substrate or original existing MoS2 films. At the initial stage (1 to 3 ALD cycles), the density of MoS2 materials increases with ALD cycle increasing, while large area of continuous MoS2 film on the substrate can be obtained when 4 or more ALD cycles are applied. By this way, excellent triangular crystal of MoS2 with controlled atomic size in thickness and highly oriented hexagonal crystal structure can be obtained by applying definite ALD cycles.

  19. Layer thickness-dependent phonon properties and thermal conductivity of MoS2

    NASA Astrophysics Data System (ADS)

    Gu, Xiaokun; Li, Baowen; Yang, Ronggui

    2016-02-01

    For conventional materials, the thermal conductivity of thin films is usually suppressed when the thickness decreases due to phonon-boundary scattering. However, this is not necessarily true for the van der Waals solids if the thickness is reduced to only a few layers. In this letter, the layer thickness-dependent phonon properties and thermal conductivity in the few-layer MoS2 are studied using the first-principles-based Peierls-Boltzmann transport equation approach. The basal-plane thermal conductivity of 10-μm-long samples is found to monotonically reduce from 138 W/mK to 98 W/mK for naturally occurring MoS2, and from 155 W/mK to 115 W/mK for isotopically pure MoS2, when its thickness increases from one layer to three layers. The thermal conductivity of tri-layer MoS2 approaches to that of bulk MoS2. Both the change of phonon dispersion and the thickness-induced anharmonicity are important for explaining such a thermal conductivity reduction. The increased anharmonicity in bi-layer MoS2 results in stronger phonon scattering for ZAi modes, which is linked to the breakdown of the symmetry in single-layer MoS2.

  20. Nanostructured MoS2/BiVO4 Composites for Energy Storage Applications

    PubMed Central

    Arora, Yukti; Shah, Amit P.; Battu, Shateesh; Maliakkal, Carina B.; Haram, Santosh; Bhattacharya, Arnab; Khushalani, Deepa

    2016-01-01

    We report the optimized synthesis and electrochemical characterization of a composite of few-layered nanostructured MoS2 along with an electroactive metal oxide BiVO4. In comparison to pristine BiVO4, and a composite of graphene/BiVO4, the MoS2/BiVO4 nanocomposite provides impressive values of charge storage with longer discharge times and improved cycling stability. Specific capacitance values of 610 Fg−1 (170 mAhg−1) at 1 Ag−1 and 166 Fg−1 (46 mAhg−1) at 10 Ag−1 were obtained for just 2.5 wt% MoS2 loaded BiVO4. The results suggest that the explicitly synthesized small lateral-dimensioned MoS2 particles provide a notable capacitive component that helps augment the specific capacitance. We discuss the optimized synthesis of monoclinic BiVO4, and few-layered nanostructured MoS2. We report the discharge capacities and cycling performance of the MoS2/BiVO4 nanocomposite using an aqueous electrolyte. The data obtained shows the MoS2/BiVO4 nanocomposite to be a promising candidate for supercapacitor energy storage applications. PMID:27808122