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Sample records for 3x nm node

  1. Illumination optimization for 65nm technology node

    NASA Astrophysics Data System (ADS)

    Wang, Ching-Heng; Liu, Qingwei; Zhang, Liguo; Hung, Chi-Yuan

    2006-10-01

    The most important task of the microlithography process is to make the manufacturable process latitude/window, including dose latitude and Depth of Focus, as wide as possible. Thus, to perform a thorough source optimization during process development is becoming more critical as moving to high NA technology nodes. Furthermore, Optical proximity correction (OPC) are always used to provide a common process window for structures that would, otherwise, have no overlapping windows. But as the critical dimension of the IC design shrinks dramatically, the flexibility for applying OPC also decreases. So a robust microlithography process should also be OPC-friendly. This paper demonstrates our work on the illumination optimization during the process development. The Calibre ILO (Illumination Optimization) tool was used to perform the illumination optimization and provided plots of DOF vs. various parametric illumination settings. This was used to screen the various illumination settings for the one with optimum process margins. The resulting illumination conditions were then implemented and analyzed at a real wafer level on our 90/65nm critical layers, such as Active, Poly, Contact and Metal. In conclusion, based on these results, a summary is provided highlighting how OPC can get benefit from proper illumination optimization.

  2. 9nm node wafer defect inspection using visible light

    NASA Astrophysics Data System (ADS)

    Zhou, Renjie; Edwards, Chris; Popescu, Gabriel; Goddard, Lynford L.

    2014-04-01

    Over the past 2 years, we have developed a common optical-path, 532 nm laser epi-illumination diffraction phase microscope (epi-DPM) and successfully applied it to detect different types of defects down to 20 by 100 nm in a 22nm node intentional defect array (IDA) wafer. An image post-processing method called 2DISC, using image frame 2nd order differential, image stitching, and convolution, was used to significantly improve sensitivity of the measured images. To address 9nm node IDA wafer inspection, we updated our system with a highly stable 405 nm diode laser. By using the 2DISC method, we detected parallel bridge defects in the 9nm node wafer. To further enhance detectability, we are exploring 3D wafer scanning, white-light illumination, and dark-field inspection.

  3. 28nm node process optimization: a lithography centric view

    NASA Astrophysics Data System (ADS)

    Seltmann, Rolf

    2014-10-01

    Many experts claim that the 28nm technology node will be the most cost effective technology node forever. This results from primarily from the cost of manufacturing due to the fact that 28nm is the last true Single Patterning (SP) node. It is also affected by the dramatic increase of design costs and the limited shrink factor of the next following nodes. Thus, it is assumed that this technology still will be alive still for many years. To be cost competitive, high yields are mandatory. Meanwhile, leading edge foundries have optimized the yield of the 28nm node to such a level that that it is nearly exclusively defined by random defectivity. However, it was a long way to go to come to that level. In my talk I will concentrate on the contribution of lithography to this yield learning curve. I will choose a critical metal patterning application. I will show what was needed to optimize the process window to a level beyond the usual OPC model work that was common on previous nodes. Reducing the process (in particular focus) variability is a complementary need. It will be shown which improvements were needed in tooling, process control and design-mask-wafer interaction to remove all systematic yield detractors. Over the last couple of years new scanner platforms were introduced that were targeted for both better productivity and better parametric performance. But this was not a clear run-path. It needed some extra affords of the tool suppliers together with the Fab to bring the tool variability down to the necessary level. Another important topic to reduce variability is the interaction of wafer none-planarity and lithography optimization. Having an accurate knowledge of within die topography is essential for optimum patterning. By completing both the variability reduction work and the process window enhancement work we were able to transfer the original marginal process budget to a robust positive budget and thus ensuring high yield and low costs.

  4. Considerations for fine hole patterning for the 7nm node

    NASA Astrophysics Data System (ADS)

    Yaegashi, Hidetami; Oyama, Kenichi; Hara, Arisa; Natori, Sakurako; Yamauchi, Shohei; Yamato, Masatoshi; Koike, Kyohei

    2016-03-01

    One of the practical candidates to produce 7nm node logic devices is to use the multiple patterning with 193-immersion exposure. For the multiple patterning, it is important to evaluate the relation between the number of mask layer and the minimum pitch systematically to judge the device manufacturability. Although the number of the time of patterning, namely LE(Litho-Etch) ^ x-time, and overlay steps have to be reduced, there are some challenges in miniaturization of hole size below 20nm. Various process fluctuations on contact hole have a direct impact on device performance. According to the technical trend, 12nm diameter hole on 30nm-pitch hole will be needed on 7nm node. Extreme ultraviolet lithography (EUV) and Directed self-assembly (DSA) are attracting considerable attention to obtain small feature size pattern, however, 193-immersion still has the potential to extend optical lithography cost-effectively for sub-7nm node. The objective of this work is to study the process variation challenges and resolution in post-processing for the CD-bias control to meet sub-20nm diameter contact hole. Another pattern modulation is also demonstrated during post-processing step for hole shrink. With the realization that pattern fidelity and pattern placement management will limit scaling long before devices and interconnects fail to perform intrinsically, the talk will also outline how circle edge roughness (CER) and Local-CD uniformity can correct efficiency. On the other hand, 1D Gridded-Design-Rules layout (1D layout) has simple rectangular shapes. Also, we have demonstrated CD-bias modification on short trench pattern to cut grating line for its fabrication.

  5. Resist reflow process for arbitrary 32 nm node pattern

    NASA Astrophysics Data System (ADS)

    Park, Joon-Min; An, Ilsin; Oh, Hye-Keun

    2008-03-01

    In order to shrink down the contact hole which is usually much larger than other patterns, the resist reflow process (RRP) has been widely used. Various types, shapes, and pitches of contact hole arrays are made by RRP, but RRP was limited to be used only for contact hole patterns. The same RRP method is expanded to 32 nm node arbitrary and complex patterns including dense line and space patterns. There might be simple 1-dimensional patterns, but 2-dimensional proximity conflict patterns are difficult to make in general. Specially, the data split with proximity correction needs a lot of attention for double patterning. 32 nm node arbitrary patterns can be easily made by using RRP without complex data split.

  6. Resist Reflow Process for 32 nm Node Arbitrary Pattern

    NASA Astrophysics Data System (ADS)

    Park, Joon-Min; An, Ilsin; Oh, Hye-Keun

    2009-04-01

    In order to decrease the size of contact holes, which is usually much larger than other patterns, the resist reflow process (RRP) has been widely used. Various types, shapes, and pitches of contact hole arrays are generated by RRP, but the use of RRP was limited to only contact hole patterns. The use of the same RRP method is expanded to 32 nm node arbitrary and complex patterns including dense line and space patterns. There might be simple one-dimensional patterns, but two-dimensional proximity conflict patterns are difficult to generate in general. In particular, the data split with proximity correction requires much attention for double patterning. 32 nm node arbitrary patterns could be generated using RRP without complex data splits when high-index fluid immersion lithography [numerical aperture (NA) 1.55] is used.

  7. Self-assembled WO3-x hierarchical nanostructures for photothermal therapy with a 915 nm laser rather than the common 980 nm laser.

    PubMed

    Li, Bo; Zhang, Yuxin; Zou, Rujia; Wang, Qian; Zhang, Bingjie; An, Lei; Yin, Fei; Hua, Yingqi; Hu, Junqing

    2014-04-28

    Photothermal therapy (PTT) is limited by unsuitable photothermal agents and near-infrared (NIR) light. Herein, self-assembled PEGylated WO3-x hierarchical nanostructures, which could serve as excellent laser-cavity mirrors, were successfully prepared via a simple one-pot solvothermal route. The as-prepared WO3-x hierarchical nanostructures displayed strong near-infrared absorption. The absorption of pure water at 980 nm is 30 times higher than that at 915 nm, and the temperature of water only increased by 3.4 °C under the irradiation of a 915 nm laser with a power density of 1.0 W cm(-2) for 10 min, while the temperature of water increased as much as 15.1 °C for the 980 nm laser. With continuous excitation by 915 nm light, the photothermal conversion efficiency of these WO3-x hierarchical nanostructures was evaluated to be 28.1%. Thus, the WO3-x hierarchical nanostructures could serve as excellent laser-cavity mirrors of a 915 nm laser. The PTT study on cancer cells in vivo demonstrated that the WO3-x hierarchical nanostructures can generate enough heat for efficient photothermal therapy of cancer cells under the irradiation of a 915 nm laser with a power density of 1.2 W cm(-2) over a short period (5-10 min).

  8. Taking the X Architecture to the 65-nm technology node

    NASA Astrophysics Data System (ADS)

    Sarma, Robin C.; Smayling, Michael C.; Arora, Narain; Nagata, Toshiyuki; Duane, Michael P.; Shah, Santosh; Keston, Harris J.; Oemardani, Shiany

    2004-05-01

    The X Architecture is a new way of orienting the interconnect on an integrated circuit using diagonal pathways, as well as the traditional right-angle, or Manhattan, configuration. By enabling designs with significantly less wire and fewer vias, the X Architecture can provide substantial improvements in chip performance, power consumption and cost. Members of the X Initiative semiconductor supply chain consortium have demonstrated the production worthiness of the X Architecture at the 130-nm and 90-nm process technology nodes. This paper presents an assessment of the manufacturing readiness of the X Architecture for the 65-nm technology node. The extent to which current production capabilities in mask writing, lithography, wafer processing, inspection and metrology can be used is discussed using the results from a 65-nm test chip. The project was a collaborative effort amongst a number of companies in the IC fabrication supply chain. Applied Materials fabricated the 65-nm X Architecture test chip at its Maydan Technology Center and leveraged the technology of other X Initiative members. Cadence Design Systems provided the test structure design and chip validation tools, Dai Nippon Printing produced the masks and Canon"s imaging system was employed for the photolithography.

  9. Polymer and Material Design for Lithography From 50 nm Node to the sub-16 nm Node

    NASA Astrophysics Data System (ADS)

    Trefonas, Peter

    2012-02-01

    Microlithography is one of the technologies which enabled the Information Age. Developing at the intersection of optical physics, polymer science and photochemistry, the need for ever smaller high fidelity patterns to build integrated circuits is currently pushing the technology evolution from 193 nm immersion lithography to extreme ultraviolet lithography (13.5 nm) to alternate patterning technologies such as directed self assembly (DSA) of block copolymers. Essential to the success of this progression is a rapid application of new concepts and materials in polymer science. We will discuss the requirements for 193 immersion lithography and how advanced acrylic random polymers are being designed with chemical amplification functionality to meet these needs. The special requirements of a water immersion lithography led to the invention and rapid commercial application of surface assembled embedded barrier layer polymers. Design of polymers for EUV lithography is having to respond to much different challenges, prominent being the dearth of photons in the exposure step, and the other being how to maximize the efficiency of photoacid production. In parallel, alternative lithographic approaches are being developed using directed self assembly of block copolymers which realize pattern frequency multiplication. We will update with our progress in the applications of polymers designed for DSA.

  10. Application of atomic force microscope to 65-nm node photomasks

    NASA Astrophysics Data System (ADS)

    Tanaka, Yoshiyuki; Itou, Yasutoshi; Yoshioka, Nobuyuki; Matsuyama, Katsuhiro; Dawson, Dean J.

    2004-08-01

    The technology node of semiconductor device production is progressing to 65nm generation. For the 65nm photomasks, the target specifications of defect size and repair accuracy are 52nm and 7nm, respectively. Especially, real defects on photomasks are not only simple two-dimensional patterns but also three-dimensional shapes such as phase shift defects and contamination, thus we need to recognize defect shapes accurately. Additionally, AAPSM's Cr patterns overhang, and we have to measure defects on three-dimensional shapes. To evaluate them, we use an AFM metrology system, Dimension X3D (Veeco), having both precise CD measurement repeatability (2nm) and high resolution for defects. In this report, we show the performance of the AFM metrology system. First, we evaluated CD metrology performance, CD repeatbility about four type photomasks: NEGA-BIM, POSI-BIM, KrF-HT and ArF-HT, and all masks met specifications. Next, we evaluated defect pattern shapes and AAPSM and CPL mask patterns. Consequently, we have confirmed that the AFM metrology system has high performance for 65nm photomasks.

  11. NXT:1980Di immersion scanner for 7nm and 5nm production nodes

    NASA Astrophysics Data System (ADS)

    de Graaf, Roelof; Weichselbaum, Stefan; Droste, Richard; McLaren, Matthew; Koek, Bert; de Boeij, Wim

    2016-03-01

    Immersion scanners remain the critical lithography workhorses in semiconductor device manufacturing. When progressing towards the 7nm device node for logic and D18 device node for DRAM production, pattern-placement and layer-to-layer overlay requirements keep progressively scaling down and consequently require system improvements in immersion scanners. The on-product-overlay requirements are approaching levels of only a few nanometers, imposing stringent requirements on the scanner tool design in terms of reproducibility, accuracy and stability. In this paper we report on the performance of the NXT:1980Di immersion scanner. The NXT:1980Di builds upon the NXT:1970Ci, that is widely used for 16nm, 14nm and 10nm high-volume manufacturing. We will discuss the NXT:1980Di system- and sub-system/module enhancements that drive the scanner overlay, focus and productivity performance. Overlay, imaging, focus, productivity and defectivity data will be presented for multiple tools. To further reduce the on-product overlay system performance, alignment sensor contrast improvements as well as active reticle temperature conditioning are implemented on the NXT:1980Di. Reticle temperature conditioning will reduce reticle heating overlay and the higher contrast alignment sensor will improve alignment robustness for processed alignment targets. Due to an increased usage of multiple patterning techniques, an increased number of immersion exposures is required. NXT:1980Di scanner design modifications raised productivity levels from 250wph to 275wph. This productivity enhancement provides lower cost of ownership (CoO) for customers using immersion technology.

  12. Megasonic cleaning: possible solutions for 22nm node and beyond

    NASA Astrophysics Data System (ADS)

    Shende, Hrishi; Singh, Sherjang; Baugh, James; Mann, Raunak; Dietze, Uwe; Dress, Peter

    2011-11-01

    Megasonic energy transfer to the photomask surface is indirectly controlled by process parameters that provide an effective handle to physical force distribution on the photomask surface. A better understanding of the influence of these parameters on the physical force distribution and their effect on pattern damage of fragile mask features can help optimize megasonic energy transfer as well as assist in extending this cleaning technology beyond the 22nm node. In this paper we have specifically studied the effect of higher megasonic frequencies (3 & 4MHz) and media gasification on pattern damage; the effect of cleaning chemistry, media volume flow rate, process time, and nozzle distance to the mask surface during the dispense is also discussed. Megasonic energy characterization is performed by measuring the acoustic energy as well as cavitation created by megasonic energy through sonoluminescence measurements.

  13. Advanced metrology for the 14 nm node double patterning lithography

    NASA Astrophysics Data System (ADS)

    Carau, D.; Bouyssou, R.; Dezauzier, C.; Besacier, M.; Gourgon, C.

    2014-05-01

    In microelectronics the two crucial parameters for the lithography step are the critical dimension, which is the width of the smallest printable pattern, and the misalignment error of the reticle, called overlay. For the 14 nm node, the limit of scanner resolution can be overcome by the double patterning technique, which requires a maximum overlay error between the two reticles of 3 nm [1]. The current approach in the measurements of critical dimension and overlay is to treat them separately, but it has become much more complex in the double patterning context, since they are no longer independent. In this paper, a strategy of a common measurement is developed. The aim of the strategy is to measure simultaneously overlay and critical dimension in the metal level double patterning grating before the second etch process. The scatterometry technique is well known for critical dimension measurement. This study demonstrates that the overlay between the two gratings can also be deduced. Thanks to this original scatterometry-based method, it becomes possible to provide information on the lithography step quality before the second etch process; therefore the lithography can be reworked if it is necessary.

  14. OPC structures for maskshops qualification for the CMOS65nm and CMOS45nm nodes

    NASA Astrophysics Data System (ADS)

    Sundermann, Frank; Trouiller, Yorick; Urbani, Jean-Christophe; Couderc, Christophe; Belledent, Jérôme; Borjon, Amandine; Foussadier, Franck; Gardin, Christian; LeCam, Laurent; Rody, Yves; Saied, Mazen; Yesilada, Emek; Martinelli, Catherine; Wilkinson, Bill; Vautrin, Florent; Morgana, Nicolo; Robert, Frederic; Montgomery, Patrick; Kerrien, Gurwan; Planchot, Jonathan; Farys, Vincent; Di Maria, Jean-Luc

    2007-02-01

    Several qualification stages are required for new maskshop tools, first step is done by the maskshop internally. Taking a new writer for example, the maskshop will review the basic factory and site acceptance tests, including CD uniformity, CD linearity, local CD errors and registration errors. The second step is to have dedicated OPC (Optical Proximity Correction) structures from the wafer fab. These dedicated OPC structures will be measured by the maskshop to get a reticle CD metrology trend line. With this trend line, we can: - ensure the stability at reticle level of the maskshop processes - put in place a matching procedure to guarantee the same OPC signature at reticle level in case of any internal maskshop process change or new maskshop evaluation. Changes that require qualification could be process changes for capacity reasons, like introducing a new writer or a new manufacturing line, or for capability reasons, like a new process (new developer tool for example) introduction. Most advanced levels will have dedicated OPC structures. Also dedicated maskshop processes will be monitored with these specific OPC structures. In this paper, we will follow in detail the different reticle CD measurements of dedicated OPC structures for the three advanced logic levels of the 65nm node: poly level, contact level and metal level. The related maskshop's processes are - for poly: eaPSM 193nm with a nega CAR (Chemically Amplified Resist) process for Clear Field L/S (Lines & Space) reticles - for contact: eaPSM 193nm with a posi CAR process for Dark Field Holes reticles - for metal1: eaPSM 193nm with a posi CAR process for Dark Field L/S reticles. For all these structures, CD linearity, CD through pitch, length effects, and pattern density effects will be monitored. To average the metrology errors, the structures are placed twice on the reticle. The first part of this paper will describe the different OPC structures. These OPC structures are close to the DRM (Design Rule

  15. 9nm node wafer defect inspection using three-dimensional scanning, a 405nm diode laser, and a broadband source

    NASA Astrophysics Data System (ADS)

    Zhou, Renjie; Edwards, Chris; Bryniarski, Casey A.; Popescu, Gabriel; Goddard, Lynford L.

    2015-03-01

    We recently built a 405nm laser based optical interferometry system for 9nm node patterned wafer defect inspection. Defects with volumes smaller than 15nm by 90nm by 35nm have been detected. The success of defect detection relied on accurate mechanical scanning of the wafer and custom engineered image denoising post-processing. To further improve the detection sensitivity, we designed a higher precision XYZ scanning stage and replaced the laser source with an incoherent LED to remove the speckle noise. With these system modifications, we successfully detected both defects and surface contamination particles in bright-field imaging mode. Recently, we have upgraded this system for interferometric defect inspection.

  16. Low-k/copper integration scheme suitable for ULSI manufacturing from 90nm to 45nm nodes

    NASA Astrophysics Data System (ADS)

    Nogami, T.; Lane, S.; Fukasawa, M.; Ida, K.; Angyal, M.; Chanda, K.; Chen, F.; Christiansen, C.; Cohen, S.; Cullinan, M.; Dziobkowski, C.; Fitzsimmons, J.; Flaitz, P.; Grill, A.; Gill, J.; Inoue, K.; Klymko, N.; Kumar, K.; Labelle, C.; Lane, M.; Li, B.; Liniger, E.; Madon, A.; Malone, K.; Martin, J.; McGahay, V.; McLaughlin, P.; Melville, I.; Minami, M.; Molis, S.; Nguyen, S.; Penny, C.; Restaino, D.; Sakamoto, A.; Sankar, M.; Sherwood, M.; Simonyi, E.; Shimooka, Y.; Tai, L.; Widodo, J.; Wildman, H.; Ono, M.; McHerron, D.; Nye, H.; Davis, C.; Sankaran, S.; Edelstein, D.; Ivers, T.

    2005-11-01

    This paper discusses low-k/copper integration schemes which has been in production in the 90 nm node, have been developed in the 65 nm node, and should be taken in the 45 nm node. While our baseline 65 nm BEOL process has been developed by extension and simple shrinkage of our PECVD SiCOH integration which has been in production in the 90 nm node with our SiCOH film having k=3.0, the 65 nm SiCOH integration has two other options to go to extend to lower capacitance. One is to add porosity to become ultra low-k (ULK). The other is to stay with low-k SiCOH, which is modified to have a "lower-k". The effective k- value attained with the lower-k (k=2.8) SiCOH processed in the "Direct CMP" scheme is very close to that with an ULK (k=2.5) SiCOH film built with the "Hard Mask Retention" scheme. This paper first describes consideration of these two damascene schemes, whose comparison leads to the conclusion that the lower-k SiCOH integration can have more advantages in terms of process simplicity and extendibility of our 90 nm scheme under certain assumptions. Then describing the k=2.8 SiCOH film development and its successful integration, damascene schemes for 45nm nodes are discussed based on our learning from development of the lower-k 65nm scheme. Capability of modern dry etchers to define the finer patterns, non-uniformity of CMP, and susceptibility to plasma and mechanical strength and adhesion of ULK are discussed as factors to hamper the applicability of ULK.

  17. Revisit pattern collapse for 14nm node and beyond

    NASA Astrophysics Data System (ADS)

    Yoshimoto, Kenji; Higgins, Craig; Raghunathan, Ananthan; Hartley, John G.; Goldfarb, Dario L.; Kato, Hirokazu; Petrillo, Karen; Colburn, Matthew E.; Schefske, Jeffrey; Wood, Obert; Wallow, Thomas I.

    2011-04-01

    In this study, we have analyzed new data sets of pattern collapse obtained from 300 mm wafers which were coated with a process-of-record (POR) EUV resist and exposed by an EUV Alpha-Demo tool (ADT) and a Vistec VB300 e-beam exposure tool. In order to minimize any processing effects on pattern collapse, the same POR EUV track process was applied to both exposures. A key metric of our analysis is the critical aspect ratio of collapse (CARC)1. We found that CARC of POR EUV resist decreases monotonically with spacing, in the range of ~1.8-2.2 at ~32-54 nm space (60-80 nm pitch) for EUV, and ~1.5-2.1 at ~16-50 nm space (~46-80 nm pitch) for e-beam. We also estimated an apparent Young's modulus of POR EUV resist by fitting a collapse model2 to the CARC data. The resulting modulus ~0.30 GPa was much smaller than the modulus of typical polymer glasses (~1.0-5.0 GPa). Our findings suggest that due to a significant decrease of resist mechanical properties and a sharp increase in capillary force, it will be challenging to maintain aspect ratios above 2.0 for sub-30 nm resist spacing (sub-60 nm pitches). For patterning at these dimensions, alternate processes and materials will become increasingly necessary, e.g. surfactant-based rinse solutions3 and other approaches.

  18. HVM metrology challenges towards the 5nm node

    NASA Astrophysics Data System (ADS)

    Bunday, Benjamin

    2016-03-01

    This paper will provide a high level overview of the future for in-line high volume manufacturing (HVM) metrology for the semiconductor industry. First, we will take a broad view of the needs of patterned defect, critical dimensional (CD/3D) and films metrology, and present the extensive list of applications for which metrology solutions are needed. Commonalities and differences among the various applications will be shown. We will then report on the gating technical limits of the most important of these metrology solutions to address the metrology challenges of future nodes, highlighting key metrology technology gaps requiring industry attention and investment.

  19. Extension of 193 nm dry lithography to 45-nm half-pitch node: double exposure and double processing technique

    NASA Astrophysics Data System (ADS)

    Biswas, Abani M.; Li, Jianliang; Hiserote, Jay A.; Melvin, Lawrence S., III

    2006-10-01

    Immersion lithography and multiple exposure techniques are the most promising methods to extend lithography manufacturing to the 45nm node. Although immersion lithography has attracted much attention recently as a promising optical lithography extension, it will not solve all the problems at the 45-nm node. The 'dry' option, (i.e. double exposure/etch) which can be realized with standard processing practice, will extend 193-nm lithography to the end of the current industry roadmap. Double exposure/etch lithography is expensive in terms of cost, throughput time, and overlay registration accuracy. However, it is less challenging compared to other possible alternatives and has the ability to break through the κ I barrier (0.25). This process, in combination with attenuated PSM (att-PSM) mask, is a good imaging solution that can reach, and most likely go beyond, the 45-nm node. Mask making requirements in a double exposure scheme will be reduced significantly. This can be appreciated by the fact that the separation of tightly-pitched mask into two less demanding pitch patterns will reduce the stringent specifications for each mask. In this study, modeling of double exposure lithography (DEL) with att-PSM masks to target 45-nm node is described. In addition, mask separation and implementation issues of optical proximity corrections (OPC) to improve process window are studied. To understand the impact of OPC on the process window, Fourier analysis of the masks has been carried out as well.

  20. Imaging performance and challenges of 10nm and 7nm logic nodes with 0.33 NA EUV

    NASA Astrophysics Data System (ADS)

    van Setten, Eelco; Schiffelers, Guido; Psara, Eleni; Oorschot, Dorothe; Davydova, Natalia; Finders, Jo; Depre, Laurent; Farys, Vincent

    2014-10-01

    The NXE:3300B is ASML's third generation EUV system and has an NA of 0.33 and is positioned at a resolution of 22nm, which can be extended down to 18nm and below with off-axis illumination at full transmission. Multiple systems have been qualified and installed at customers. The NXE:3300B succeeds the NXE:3100 system (NA of 0.25), which has allowed customers to gain valuable EUV experience. It is expected that EUV will be adopted first for critical Logic layers at 10nm and 7nm nodes, such as Metal-1, to avoid the complexity of triple patterning schemes using ArF immersion. In this paper we will evaluate the imaging performance of (sub-)10nm node Logic M1 on the NXE:3300B EUV scanner. We will show the line-end performance of tip-to-tip and tip-to-space test features for various pitches and illumination settings and the performance enhancement obtained by means of a 1st round of OPC. We will also show the magnitude of local variations. The Logic M1 cell is evaluated at various critical features to identify hot spots. A 2nd round OPC model was calibrated of which we will show the model accuracy and ability to predict hot spots in the Logic M1 cell. The calibrated OPC model is used to predict the expected performance at 7nm node Logic using off-axis illumination at 16nm minimum half pitch. Initial results of L/S exposed on the NXE:3300B at 7nm node resolutions will be shown. An outlook is given to future 0.33 NA systems on the ASML roadmap with enhanced illuminator capabilities to further improve performance and process window.

  1. Characterization of 32nm node BEOL grating structures using scatterometry

    NASA Astrophysics Data System (ADS)

    Zangooie, Shahin; Sendelbach, Matthew; Angyal, Matthew; Archie, Charles; Vaid, Alok; Matthew, Itty; Herrera, Pedro

    2008-03-01

    Implementations of scatterometry in the back end of the line (BEOL) of the devices requires design of advanced measurement targets with attention to CMP ground rule constraints as well as model simplicity details. In this paper we outline basic design rules for scatterometry back end targets by stacking and staggering measurement pads to reduce metal pattern density in the horizontal plane of the device and to avoid progressive dishing problems along the vertical direction. Furthermore, important characteristics of the copper shapes in terms of their opaqueness and uniformity are discussed. It is shown that the M1 copper thicknesses larger than 100 nm are more than sufficient for accurate back end scatterometry implementations eliminating the need for modeling of contributions from the buried layers. AFM and ellipsometry line scans also show that the copper pads are sufficiently uniform with a sweet spot area of around 20 μm. Hence, accurate scatterometry can be done with negligible edge and/or dishing contributions if the measurement spot is placed any where within the sweet spot area. Reference metrology utilizing CD-SEM and CD-AFM techniques prove accuracy of the optical solutions for the develop inspect and final inspect grating structures. The total measurement uncertainty (TMU) values for the process of record line width are of the order of 0.77 nm and 0.35 nm at the develop inspect and final inspect levels, respectively.

  2. Radiation Performance of 1 Gbit DDR SDRAMs Fabricated in the 90 nm CMOS Technology Node

    NASA Technical Reports Server (NTRS)

    Ladbury, Raymond L.; Gorelick, Jerry L.; Berg, M. D.; Kim, H.; LaBel, K.; Friendlich, M.; Koga, R.; George, J.; Crain, S.; Yu, P.; Reed, R. A.

    2006-01-01

    We present Single Event Effect (SEE) and Total Ionizing Dose (TID) data for 1 Gbit DDR SDRAMs (90 nm CMOS technology) as well as comparing this data with earlier technology nodes from the same manufacturer.

  3. 22 nm node wafer inspection using diffraction phase microscopy and image post-processing

    NASA Astrophysics Data System (ADS)

    Zhou, Renjie; Popescu, Gabriel; Goddard, Lynford L.

    2013-04-01

    We applied epi-illumination diffraction phase microscopy to measure the amplitude and phase of the scattered field from a SEMATECH 22 nm node intentional defect array (IDA) wafer. We used several imaging processing techniques to remove the wafer's underlying structure and reduce both the spatial and temporal noise and eliminate the system calibration error to produce stretched panoramic amplitude and phase images. From the stretched images, we detected defects down to 20 nm × 160 nm for a parallel bridge, 20 nm × 100 nm for perpendicular bridge, and 35 nm × 70 nm for an isolated dot.

  4. Writing time estimation of EB mask writer EBM-9000 for hp16nm/logic11nm node generation

    NASA Astrophysics Data System (ADS)

    Kamikubo, Takashi; Takekoshi, Hidekazu; Ogasawara, Munehiro; Yamada, Hirokazu; Hattori, Kiyoshi

    2014-10-01

    The scaling of semiconductor devices is slowing down because of the difficulty in establishing their functionality at the nano-size level and also because of the limitations in fabrications, mainly the delay of EUV lithography. While multigate devices (FinFET) are currently the main driver for scalability, other types of devices, such as 3D devices, are being realized to relax the scaling of the node. In lithography, double or multiple patterning using ArF immersion scanners is still a realistic solution offered for the hp16nm node fabrication. Other lithography candidates are those called NGL (Next Generation Lithography), such as DSA (Directed-Self-Assembling) or nanoimprint. In such situations, shot count for mask making by electron beam writers will not increase. Except for some layers, it is not increasing as previously predicted. On the other hand, there is another aspect that increases writing time. The exposure dose for mask writing is getting higher to meet tighter specifications of CD uniformity, in other words, reduce LER. To satisfy these requirements, a new electron beam mask writer, EBM-9000, has been developed for hp16nm/logic11nm generation. Electron optical system, which has the immersion lens system, was evolved from EBM-8000 to achieve higher current density of 800A/cm2. In this paper, recent shot count and dose trend are discussed. Also, writing time is estimated for the requirements in EBM-9000.

  5. Achieving CDU requirement for 90-nm technology node and beyond with advanced mask making process technology

    NASA Astrophysics Data System (ADS)

    Tzu, San-De; Chang, Chung-Hsing; Chen, Wen-Chi; Kliem, Karl-Heinz; Hudek, Peter; Beyer, Dirk

    2005-01-01

    For 90nm node and beyond technology generations, one of the most critical challenges is how to meet the local CD uniformity (proximity) and global CD uniformity (GCDU) requirements within the exposure field. Both of them must be well controlled in the mask making process: (1) proximity effect and, (2) exposure pattern loading effect, or the so-called e-beam "fogging effect". In this paper, we report a method to improve our global CDU by means of a long range fogging compensation together with the Leica SB350 MW. This exposure tool is operated at 50keV and 1nm design grid. The proximity correction is done by the software - package "PROXECCO" from PDF Solutions. We have developed a unique correction method to reduce the fogging effect in dependency of the pattern density of the mask. This allows us to meet our customers" CDU specifications for the 90nm node and beyond.

  6. Reflective electron-beam lithography performance for the 10nm logic node

    NASA Astrophysics Data System (ADS)

    Freed, Regina; Gubiotti, Thomas; Sun, Jeff; Cheung, Anthony; Yang, Jason; McCord, Mark; Petric, Paul; Carroll, Allen; Ummethala, Upendra; Hale, Layton; Hench, John; Kojima, Shinichi; Mieher, Walter; Bevis, Chris F.

    2012-11-01

    Maskless electron beam lithography has the potential to extend semiconductor manufacturing to the sub-10 nm technology node. KLA-Tencor is currently developing Reflective Electron Beam Lithography (REBL) for high-volume 10 nm logic (16 nm HP). This paper reviews progress in the development of the REBL system towards its goal of 100 wph throughput for High Volume Lithography (HVL) at the 2X and 1X nm nodes. In this paper we introduce the Digital Pattern Generator (DPG) with integrated CMOS and MEMs lenslets that was manufactured at TSMC and IMEC. For REBL, the DPG is integrated to KLA-Tencor pattern generating software that can be programmed to produce complex, gray-scaled lithography patterns. Additionally, we show printing results for a range of interesting lithography patterns using Time Domain Imaging (TDI). Previously, KLA-Tencor reported on the development of a Reflective Electron Beam Lithography (REBL) tool for maskless lithography at and below the 22 nm technology node1. Since that time, the REBL team and its partners (TSMC, IMEC) have made good progress towards developing the REBL system and Digital Pattern Generator (DPG) for direct write lithography. Traditionally, e-beam direct write lithography has been too slow for most lithography applications. Ebeam direct write lithography has been used for mask writing rather than wafer processing since the maximum blur requirements limit column beam current - which drives e-beam throughput. To print small features and a fine pitch with an e-beam tool requires a sacrifice in processing time unless one significantly increases the total number of beams on a single writing tool. Because of the continued uncertainty with regards to the optical lithography roadmap beyond the 22 nm technology node, the semiconductor equipment industry is in the process of designing and testing e-beam lithography tools with the potential for HVL.

  7. Particle removal challenges with EUV patterned mask for the sub-22nm HP node

    SciTech Connect

    Rastegar, A.; Eichenlaub, S.; Kadaksham, A. J.; Lee, B.; House, M.; Huh, S.; Cha, B.; Yun, H.; Mochi, I.; Goldberg, K. A.

    2010-03-12

    The particle removal efficiency (PRE) of cleaning processes diminishes whenever the minimum defect size for a specific technology node becomes smaller. For the sub-22 nm half-pitch (HP) node, it was demonstrated that exposure to high power megasonic up to 200 W/cm{sup 2} did not damage 60 nm wide TaBN absorber lines corresponding to the 16 nm HP node on wafer. An ammonium hydroxide mixture and megasonics removes {ge}50 nm SiO{sub 2} particles with a very high PRE, A sulfuric acid hydrogen peroxide mixture (SPM) in addition to ammonium hydroxide mixture (APM) and megasonic is required to remove {ge}28 nm SiO{sub 2} particles with a high PRE. Time-of-flight secondary ion mass spectroscopy (TOFSIMS) studies show that the presence of O{sub 2} during a vacuum ultraviolet (VUV) ({lambda} = 172 nm) surface conditioning step will result in both surface oxidation and Ru removal, which drastically reduce extreme ultraviolet (EUV) mask life time under multiple cleanings. New EUV mask cleaning processes show negligible or no EUV reflectivity loss and no increase in surface roughness after up to 15 cleaning cycles. Reviewing of defect with a high current density scanning electron microscope (SEM) drastically reduces PRE and deforms SiO{sub 2} particles. 28 nm SiO{sub 2} particles on EUV masks age very fast and will deform over time, Care must be taken when reviewing EUV mask defects by SEM. Potentially new particles should be identified to calibrate short wavelength inspection tools, Based on actinic image review, 50 nm SiO{sub 2} particles on top of the EUV mask will be printed on the wafer.

  8. Imaging challenges in 20nm and 14nm logic nodes: hot spots performance in Metal1 layer

    NASA Astrophysics Data System (ADS)

    Timoshkov, V.; Rio, D.; Liu, H.; Gillijns, W.; Wang, J.; Wong, P.; Van Den Heuvel, D.; Wiaux, V.; Nikolsky, P.; Finders, J.

    2013-10-01

    The 20nm Metal1 layer, based on ARM standard cells, has a 2D design with minimum pitch of 64nm. This 2D design requires a Litho-Etch-Litho-Etch (LELE) double patterning. The whole design is divided in 2 splits: Me1A and Me1B. But solution of splitting conflicts needs stitching at some locations, what requires good Critical Dimension (CD) and overlay control to provide reliable contact between 2 stitched line ends. ASML Immersion NXT tools are aimed at 20 and 14nm logic production nodes. Focus control requirements become tighter, as existing 20nm production logic layouts, based on ARM, have about 50-60nm focus latitude and tight CD Uniformity (CDU) specifications, especially for line ends. IMEC inspected 20nm production Metal1 ARM standard cells with a Negative Tone Development (NTD) process using the Process Window Qualification-like technique experimentally and by Brion Tachyon LMC by simulations. Stronger defects were found thru process variations. A calibrated Tachyon model proved a good overall predictability capability for this process. Selected defects are likely to be transferred to hard mask during etch. Further, CDU inspection was performed for these critical features. Hot spots showed worse CD uniformity than specifications. Intra-field CDU contribution is significant in overall CDU budget, where reticle has major impact due to high MEEF of hot spots. Tip-to-Tip and tip-to-line hot spots have high MEEF and its variation over the field. Best focus variation range was determined by best focus offsets between hot spots and its variation within the field.

  9. Considering mask pellicle effect for more accurate OPC model at 45nm technology node

    NASA Astrophysics Data System (ADS)

    Wang, Ching-Heng; Liu, Qingwei; Zhang, Liguo

    2008-11-01

    Now it comes to the 45nm technology node, which should be the first generation of the immersion micro-lithography. And the brand-new lithography tool makes many optical effects, which can be ignored at 90nm and 65nm nodes, now have significant impact on the pattern transmission process from design to silicon. Among all the effects, one that needs to be pay attention to is the mask pellicle effect's impact on the critical dimension variation. With the implement of hyper-NA lithography tools, light transmits the mask pellicle vertically is not a good approximation now, and the image blurring induced by the mask pellicle should be taken into account in the computational microlithography. In this works, we investigate how the mask pellicle impacts the accuracy of the OPC model. And we will show that considering the extremely tight critical dimension control spec for 45nm generation node, to take the mask pellicle effect into the OPC model now becomes necessary.

  10. CP element based design for 14nm node EBDW high volume manufacturing

    NASA Astrophysics Data System (ADS)

    Maruyama, Takashi; Machida, Yasuhide; Sugatani, Shinji; Takita, Hiroshi; Hoshino, Hiromi; Hino, Toshio; Ito, Masaru; Yamada, Akio; Iizuka, Tetsuya; Komatsu, Satoshi; Ikeda, Makoto; Asada, Kunihiro

    2012-03-01

    We had previously established CP (character projection) based EBDW technology for 65nm and 45nm device production. And recently we have confirmed the resolution of 14nm L&S patterns which meets 14nm and beyond node logic requirement with CP exposure. From these production achievement and resolution potential, with multi-beam EBDW and CP function, MCC [1] could be one of the most promising technologies for future high volume manufacturing if exposure throughput was drastically enhanced. We have set target throughput as 100 WPH to meet HVM (high volume manufacturing) requirement. Our designed parameters to attain 100 WPH for 14nm result in 150 beams, 10cluster, 100 Giga shots/wafer, 250A/cm^2 and 75uC/cm^2. In addition to multi-beam, drastic exposure shot reduction is indispensable to attain 100 WPH for 14nm node. We have aggressively targeted 100 Giga shot count which is equivalent to covering 300mm wafer with 0.8um x 0.8um square fairly large tile. All device circuit blocks should be structured with only CP defined parts and we should trace back to upstream design flow to RTL. We call this methodology "CP element based design". In near future, Litho-Friendly restricted design would be commonly used [3] [4]. Our CP defined tile based regular layout would be highly compatible with these ultra-regular design approaches. The primal design factors are Logic cell, Memory macro and random interconnect. We have established concepts to accomplish high volume production with CP-based EBDW at 14nm technology node.

  11. Model based hint for litho hotspot fixing beyond 20nm node

    NASA Astrophysics Data System (ADS)

    Kang, Jae-Hyun; Kim, Byung-Moo; Ha, Naya; Choi, Hung bok; Kim, Kee sup; Mohamed, Sarah; Madkour, Kareem; ElManhawy, Wael; Lee, Evan; Brunet, Jean-Marie; Kwan, Joe

    2013-03-01

    As technology nodes scale beyond 20nm node, design complexity increases and printability issues become more critical and hard for RET techniques to fix. It is now mandatory for designers to run lithography checks prior to tape out and acceptance by the foundry. As lithography compliance became a sign-off criterion, lithography hotspots are increasingly treated like DRC violations. In the case of lithography hotspot, layout edges that should be moved to fix the hotspot are not necessarily the edges directly touching it. As a result of that, providing the designer with a suggested layout movements to fix the lithography hotspot is becoming a necessity. Software solutions generating hints should be accurate and fast. In this paper we are presenting a methodology for providing hints to the designers to fix Litho-hotspots in the 20nm and beyond.

  12. Immersion and dry scanner extensions for sub-10nm production nodes

    NASA Astrophysics Data System (ADS)

    Weichselbaum, Stefan; Bornebroek, Frank; de Kort, Toine; Droste, Richard; de Graaf, Roelof F.; van Ballegoij, Rob; Botter, Herman; McLaren, Matthew G.; de Boeij, Wim P.

    2015-03-01

    Progressing towards the 10nm and 7nm imaging node, pattern-placement and layer-to-layer overlay requirements keep on scaling down and drives system improvements in immersion (ArFi) and dry (ArF/KrF) scanners. A series of module enhancements in the NXT platform have been introduced; among others, the scanner is equipped with exposure stages with better dynamics and thermal control. Grid accuracy improvements with respect to calibration, setup, stability, and layout dependency tighten MMO performance and enable mix and match scanner operation. The same platform improvements also benefit focus control. Improvements in detectability and reproducibility of low contrast alignment marks enhance the alignment solution window for 10nm logic processes and beyond. The system's architecture allows dynamic use of high-order scanner optimization based on advanced actuators of projection lens and scanning stages. This enables a holistic optimization approach for the scanner, the mask, and the patterning process. Productivity scanner design modifications esp. stage speeds and optimization in metrology schemes provide lower layer costs for customers using immersion lithography as well as conventional dry technology. Imaging, overlay, focus, and productivity data is presented, that demonstrates 10nm and 7nm node litho-capability for both (immersion & dry) platforms.

  13. Holistic overlay control for multi-patterning process layers at the 10nm and 7nm nodes

    NASA Astrophysics Data System (ADS)

    Verstappen, Leon; Mos, Evert; Wardenier, Peter; Megens, Henry; Schmitt-Weaver, Emil; Bhattacharyya, Kaustuve; Adam, Omer; Grzela, Grzegorz; van Heijst, Joost; Willems, Lotte; Wildenberg, Jochem; Ignatova, Velislava; Chen, Albert; Elich, Frank; Rajasekharan, Bijoy; Vergaij-Huizer, Lydia; Lewis, Brian; Kea, Marc; Mulkens, Jan

    2016-03-01

    Multi-patterning lithography at the 10-nm and 7-nm nodes is driving the allowed overlay error down to extreme low values. Advanced high order overlay correction schemes are needed to control the process variability. Additionally the increase of the number of split layers results in an exponential increase of metrology complexity of the total overlay and alignment tree. At the same time, the process stack includes more hard-mask steps and becomes more and more complex, with as consequence that the setup and verification of the overlay metrology recipe becomes more critical. All of the above require a holistic approach that addresses total overlay optimization from process design to process setup and control in volume manufacturing. In this paper we will present the holistic overlay control flow designed for 10-nm and 7-nm nodes and illustrate the achievable ultimate overlay performance for a logic and DRAM use case. As figure 1 illustrates we will explain the details of the steps in the holistic flow. Overlay accuracy is the driver for target design and metrology tool optimization like wavelength and polarization. We will show that it is essential to include processing effects like etching and CMP which can result in a physical asymmetry of the bottom grating of diffraction based overlay targets. We will introduce a new method to create a reference overlay map, based on metrology data using multiple wavelengths and polarization settings. A similar approach is developed for the wafer alignment step. The overlay fingerprint correction using linear or high order correction per exposure (CPE) has a large amount of parameters. It is critical to balance the metrology noise with the ultimate correction model and the related metrology sampling scheme. Similar approach is needed for the wafer align step. Both for overlay control as well as alignment we have developed methods which include efficient use of metrology time, available for an in the litho-cluster integrated

  14. Challenges in the Plasma Etch Process Development in the sub-20nm Technology Nodes

    NASA Astrophysics Data System (ADS)

    Kumar, Kaushik

    2013-09-01

    For multiple generations of semiconductor technologies, RF plasmas have provided a reliable platform for critical and non-critical patterning applications. The electron temperature of processes in a RF plasma is typically several electron volts. A substantial portion of the electron population is within the energy range accessible for different types of electron collision processes, such as electron collision dissociation and dissociative electron attachment. When these electron processes occur within a small distance above the wafer, the neutral species, radicals and excited molecules, generated from these processes take part in etching reactions impacting selectivity, ARDE and micro-loading. The introduction of finFET devices at 22 nm technology node at Intel marks the transition of planar devices to 3-dimensional devices, which add to the challenges to etch process in fabricating such devices. In the sub-32 nm technology node, Back-end-of-the-line made a change with the implementation of Trench First Metal Hard Mask (TFMHM) integration scheme, which has hence gained traction and become the preferred integration of low-k materials for BEOL. This integration scheme also enables Self-Aligned Via (SAV) patterning which prevents via CD growth and confines via by line trenches to better control via to line spacing. In addition to this, lack of scaling of 193 nm Lithography and non-availability of EUV based lithography beyond concept, has placed focus on novel multiple patterning schemes. This added complexity has resulted in multiple etch schemes to enable technology scaling below 80 nm Pitches, as shown by the memory manufacturers. Double-Patterning and Quad-Patterning have become increasingly used techniques to achieve 64 nm, 56 nm and 45 nm Pitch technologies in Back-end-of-the-line. Challenges associated in the plasma etching of these multiple integration schemes will be discussed in the presentation. In collaboration with A. Ranjan, TEL Technology Center, America

  15. Line Edge Roughness Reduction Using Resist Reflow Process for 22 nm Node Extreme Ultraviolet Lithography

    NASA Astrophysics Data System (ADS)

    Cho, In Wook; Kim, Hyunsu; You, Jee-Hye; Oh, Hye-Keun

    2010-03-01

    Extreme ultraviolet lithography (EUVL) has been developed and studied for a sub-22 nm semiconductor device. It is difficult to obtain a smooth sub-22 nm pattern because line edge roughness (LER) and linewidth roughness (LWR) cannot be controlled well. According to the 2008 ITRS roadmap, LER has to be below 1.3 nm to achieve a 22 nm node for EUVL. In our previous work, the resist reflow process (RRP), in which the resist is baked above the glass transition temperature (Tg), was very helpful for reducing LER and LWR for EUVL. LER and LWR could be decreased from ˜6 to ˜1 nm. As RRP time progresses, however, the critical dimension could become wider because the developed resist can flow more easily when the temperature is above Tg. Therefore, another method is suggested to solve this problem. The developed resist, which is intentionally designed with a 1:3 line and space (L/S) (11:33 nm) pattern, is baked above Tg. As a result, LER and LWR can be smoothed by RRP and we could achieve a 22 nm 1:1 L/S pattern with a small LER.

  16. Critical Dimension Control for 32 nm Node Random Contact Hole Array Using Resist Reflow Process

    NASA Astrophysics Data System (ADS)

    Park, Joon-Min; Kang, Young-Min; Hong, Joo-Yoo; Oh, Hye-Keun

    2008-02-01

    A 50 nm contact hole (CH) random array fabricated by resist reflow process (RRP) was studied to produce 32 nm node devices. RRP is widely used for mass production of semiconductor devices, but RRP has some restrictions because the reflow strongly depends on the array, pitch, and shape of CH. Thus, we must have full knowledge on pattern dependency after RRP, and we need to have an optimum optical proximity corrected mask including RRP to compensate the pattern dependency in random array. To fabricate optimum optical proximity- and RRP-corrected mask, we must have a better understanding of how much resist flows and CH locations after RRP. A simulation is carried out to correctly predict the RRP result by including RRP parameters such as viscosity, adhesion force, surface tension, and location of CH. As a result, we obtained uniform 50 nm CH patterns even for the random and differently shaped CH arrays by optical proximity-corrected RRP.

  17. Non-chemical cleaning technology for sub-90nm design node photomask manufacturing

    NASA Astrophysics Data System (ADS)

    Hoyeh, Star; Chen, Richard; Kozuma, Makoto; Kuo, Joann; Huang, Torey; Chen, Frank F.

    2006-10-01

    Cleaning chemistry residue in photomask manufacturing is one of root causes to generate HAZE over surface of photomask for 193nm and shorter wavelength exposure tools. In order to reduce the residue, chemical free process is one of targets in photomask industry. In this paper novel clean technology without sulfuric acid and ammonia chemical are shown to manufacture sub-90nm node photomask. Photo and E-beam resist were removed by plasma and ozone water clean instead of sulfuric acid. SPM and APM in final clean sequence before defect inspection were substituted with ozone water and hydrogen water respectively. The clean performance was demonstrated in real production of 193nm phase shift mask. Sulfate and Ammonia residue after final clean were controlled same as blank material level without any clean process.

  18. The SEMATECH Berkeley microfield exposure tool: learning a the 22-nm node and beyond

    SciTech Connect

    Naulleau, Patrick; Anderson, Christopher; Baclea-an, Lorie-Mae; Denham, Paul; George, Simi; Goldberg, Kenneth A.; Goldstein, Michael; Hoef, Brian; Hudyma, Russ; Jones, Gideon; Koh, Chawon; La Fontaine, Bruno; McClinton, Brittany; Miyakawa, Ryan; Montgomery, Warren; Roller, John; Wallow, Tom; Wurm, Stefan

    2009-02-16

    Microfield exposure tools (METs) continue to playa dominant role in the development of extreme ultraviolet (EUV) resists. One of these tools is the SEMATECH Berkeley 0.3-NA MET operating as a SEMATECH resist and mask test center. Here we present an update summarizing the latest resist test and characterization results. The relatively small numerical aperture and limited illumination settings expected from 1st generation EUV production tools make resist resolution a critical issue even at the 32-nm node. In this presentation, sub 22 nm half pitch imaging results of EUV resists are reported. We also present contact hole printing at the 30-nm level. Although resist development has progressed relatively well in the areas of resolution and sensitivity, line-edge-roughness (LER) remains a significant concern. Here we present a summary of recent LER performance results and consider the effect of system-level contributors to the LER observed from the SEMA TECH Berkeley microfield tool.

  19. Negative-tone imaging (NTI) at the 22nm node: process and material development

    NASA Astrophysics Data System (ADS)

    Cantone, Jason; Petrillo, Karen; Xu, Yongan; Landie, Guillaume; Kawakami, Shinichiro; Dunn, Shannon; Colburn, Matt

    2011-04-01

    With 22nm logic node arriving prior to EUV implementation, alternative immersion optical lithographic processes are required to drive down to smaller feature sizes. There is an ongoing effort to examine the application of the negative tone imaging (NTI) process for current and future nodes. Although NTI has previously shown difficulties with respect to swelling, high chemical reactivity with oxygen, and the need for special equipment needed for the solvent-based development, NTI photoresists (PR) typically exhibit stronger adhesion to silicon than that of positive tone photoresists (a characteristic that helps mitigate pattern collapse). We will provide suggestions on how to improve the image quality, as well as the resulting defectivity, for desired geometries. This paper will primarily focus on the full litho process optimization and demonstrate repeatable, and manufacturable critical dimension uniformity (CDU), and defectivity optimization for trench and via structures.

  20. EUV and optical lithographic pattern shift at the 5nm node

    NASA Astrophysics Data System (ADS)

    Hosler, Erik R.; Thiruvengadam, Sathish; Cantone, Jason R.; Civay, Deniz E.; Schroeder, Uwe P.

    2016-03-01

    At the 5 nm technology node there are competing strategies for patterning: high-NA EUV, double patterning 0.33 NA EUV and a combination of optical self-aligned solutions with EUV. This paper investigates the impact of pattern shift based on the selected patterning strategy. A logic standard cell connection between TS and M0 is simulated to determine the impact of lithographic pattern shift on the overlay budget. At 5 nm node dimensions, high-NA EUV is necessary to expose the most critical layers with a single lithography exposure. The impact of high-NA EUV lithography is illustrated by comparing the pattern shift resulting from 0.33 NA vs. 0.5x NA. For the example 5 nm transistor, cost-beneficial lithography layers are patterned with EUV and the other layers are patterned optically. Both EUV and optical lithography simulations are performed to determine the maximum net pattern shift. Here, lithographic pattern shift is quantified in terms of through-focus error as well as pattern-placement error. The overlay error associated with a hybrid optical/self-aligned and EUV cut patterning scheme is compared with the results of an all EUV solution, providing an assessment of two potential patterning solutions and their impact the overall overlay budget.

  1. Mask aspects of EUVL imaging at 27nm node and below

    NASA Astrophysics Data System (ADS)

    Davydova, Natalia; van Setten, Eelco; Han, Sang-In; van de Kerkhof, Mark; de Kruif, Robert; Oorschot, Dorothe; Zimmerman, John; Lammers, Ad; Connolly, Brid; Driessen, Frank; van Oosten, Anton; Dusa, Mircea; van Dommelen, Youri; Harned, Noreen; Jiang, Jiong; Liu, Wei; Kang, Hoyoung; Liu, Hua-yu

    2011-11-01

    EUVL requires the use of reflective optics including a reflective mask. The mask consists of an absorber layer pattern on top of a reflecting multilayer, tuned for 13.53 nm. The EUVL mask is a complex optical element with many parameters contributing the final wafer image quality. Specifically, the oblique incidence of light, in combination with the small ratio of wavelength to mask topography, causes a number of effects which are unique to EUV, such as an HV CD offset. These so-called shadowing effects can be corrected by means of OPC, but also need to be considered in the mask stack design. In this paper we will present an overview of the mask contributors to imaging performance at the 27 nm node and below, such as CD uniformity, multilayer and absorber stack composition, thickness and reflectivity. We will consider basic OPC and resulting MEEF and contrast. These parameters will be reviewed in the context of real-life scanner parameters both for the NXE:3100 and NXE:3300 system configurations. The predictions will be compared to exposure results on NXE:3100 tools, with NA=0.25 for different masks. Using this comparison we will extrapolate the predictions to NXE:3300, with NA=0.33. Based on the lithographic investigation, expected requirements for EUV mask parameters will be proposed for 22 nm node EUV lithography, to provide guidance for mask manufacturers to support the introduction of EUV High Volume Manufacturing.

  2. Immersion defectivity study with volume production immersion lithography tool for 45 nm node and below

    NASA Astrophysics Data System (ADS)

    Nakano, Katsushi; Nagaoka, Shiro; Yoshida, Masato; Iriuchijima, Yasuhiro; Fujiwara, Tomoharu; Shiraishi, Kenichi; Owa, Soichi

    2008-03-01

    Volume production of 45nm node devices utilizing Nikon's S610C immersion lithography tool has started. Important to the success in achieving high-yields in volume production with immersion lithography has been defectivity reduction. In this study we evaluate several methods of defectivity reduction. The tools used in our defectivity analysis included a dedicated immersion cluster tools consisting of a Nikon S610C, a volume production immersion exposure tool with NA of 1.3, and a resist coater-developer LITHIUS i+ from TEL. In our initial procedure we evaluated defectivity behavior by comparing on a topcoat-less resist process to a conventional topcoat process. Because of its simplicity the topcoatless resist shows lower defect levels than the topcoat process. In a second study we evaluated the defect reduction by introducing the TEL bevel rinse and pre-immersion bevel cleaning techniques. This technique was shown to successfully reduce the defect levels by reducing the particles at the wafer bevel region. For the third defect reduction method, two types of tool cleaning processes are shown. Finally, we discuss the overall defectivity behavior at the 45nm node. To facilitate an understanding of the root cause of the defects, defect source analysis (DSA) was applied to separate the defects into three classes according to the source of defects. DSA analysis revealed that more than 99% of defects relate to material and process, and less than 1% of the defects relate to the exposure tool. Material and process optimization by collaborative work between exposure tool vendors, track vendors and material vendors is a key for success of 45nm node device manufacturing.

  3. Top coat less resist process development for contact layer of 40nm node logic devices

    NASA Astrophysics Data System (ADS)

    Fujita, Masafumi; Uchiyama, Takayuki; Furusho, Tetsunari; Otsuka, Takahisa; Tsuchiya, Katsuhiro

    2010-04-01

    ArF immersion lithography has been introduced in mass production of 55nm node devices and beyond as the post ArF dry lithography. Due to the existence of water between the resist film and lens, we have many concerns such as leaching of PAG and quencher from resist film into immersion water, resist film swelling by water, keeping water in the immersion hood to avoid water droplets coming in contact with the wafer, and so on. We have applied to the ArF dry resist process an immersion topcoat (TC) process in order to ensure the hydrophobic property as well as one for protecting the surface. We investigate the TC-less resist process with an aim to improve CoO, the yield and productivity in mass production of immersion lithography. In this paper, we will report TC-less resist process development for the contact layer of 40nm node logic devices. It is important to control the resist surface condition to reduce pattern defects, in particular in the case of the contact layer. We evaluated defectivity and lithography performance of TC-less resist with changing hydrophobicity before and after development. Hydrophobicity of TC-less resist was controlled by changing additives with TC functions introduced into conventional ArF dry resist. However, the hydrophobicity control was not sufficient to reduce the number of Blob defects compared with the TC process. Therefore, we introduced Advanced Defect Reduction (ADR) rinse, which was a new developer rinse technique that is effective against hydrophobic surfaces. We have realized Blob defect reduction by hydrophobicity control and ADR rinse. Furthermore, we will report device performance, yield, and immersion defect data at 40nm node logic devices with TC-less resist process.

  4. RET masks for patterning 45nm node contact hole using ArF immersion lithography

    NASA Astrophysics Data System (ADS)

    Hsu, Michael; Chen, J. Fung; Van Den Broeke, Doug; En Tszng, Shih; Shieh, Jason; Hsu, Stephen; Shi, Xuelong

    2006-05-01

    Immersion exposure system with the numerical aperture (NA) greater than unity effectively extends the printing resolution limit without the need of shrinking the exposure wavelength. From the perspective of imaging contact hole mask, we are convinced that a mature ArF immersion exposure system will be able to meet 45nm node manufacturing requirement. However, from a full-chip mask data processing point of view, a more challenging question could be: how to ensure the intended RET mask to best achieve a production worthy solution? At 45nm, we are using one-fourth of the exposure wavelength for the patterning; there is very little room for error. For full-chip, especially for contact hole mask, we need a robust RET mask strategy to ensure sufficient CD control. A production-worthy RET mask technology should have good imaging performance with advanced exposure system; and, it should base on currently available mask blank material and be compatible with the existing mask making process. In this work, we propose a new type of contact hole RET masks that is capable of 45nm node full-chip manufacturing. Three types of potential RET masks are studied. The 1st type is the conventional 6% attenuated PSM (attPSM) with 0-phase Scattering Bars (SB). The 2nd type is to use CPL mask with both 0- and π-phase SB, and their relative placements are based on interference mapping lithography (IML) under optimized illumination. The 3rd type, here named as 6% CPL, can be thought of as a CPL mask type with 6% transmission on the background but with π-phase SB only. Of those three RET masks, 6% CPL mask has the best performance for printing 45nm contact and via masks. To implement 6% CPL for contact and via mask design, we study several critical process steps starting from the illumination optimization, model-based SB OPC, 3D mask effect, quartz etch depth optimization, side-lobe printability verification, and then to the mask making flow. Additionally, we investigate printability for

  5. Defect avoidance for EUV photomask readiness at the 7 nm node

    NASA Astrophysics Data System (ADS)

    Qi, Zhengqing John; Rankin, Jed; Narita, Eisuke; Kagawa, Masayuki

    2016-05-01

    Several challenges hinder extreme ultraviolet lithography (EUVL) photomask fabrication and its readiness for high volume manufacturing (HVM). The lack in availability of pristine defect-free blanks as well as the absence of a robust mask repair technique mandates defect mitigation through pattern shift for the production of defect-free photomasks. The work presented here provides a comprehensive look at pattern shift implementation to intersect EUV HVM for the 7 nm technology node. An empirical error budget to compensate for measurement variability and errors, based on the latest HVM inspection and write tool capabilities, is first established and then experimentally verified. The validated error budget is applied to 20 representative EUV blanks and pattern shift is performed on fully functional 7 nm node chip designs. The probability of defect-free masks is explored for various layers, including metal, contact, and gate cut layers. From these results, an assessment is made on the current viability of defect-free EUV masks and what is required to construct a complete defect-free EUV mask set.

  6. Robust complementary technique with multiple-patterning for sub-10 nm node device

    NASA Astrophysics Data System (ADS)

    Oyama, Kenichi; Yamauchi, Shohei; Natori, Sakurako; Hara, Arisa; Yamato, Masatoshi; Yaegashi, Hidetami

    2014-03-01

    Extreme ultraviolet (EUV) lithography is the leading candidate for sub-20nm half-pitch (hp) patterning solution, but the development of a high-output light source is still in progress thereby delaying the adoption of EUV for mass production. The evolution of 193nm immersion lithography-an exposure technology currently used in the mass production of all advanced devices-must therefore be extended, and to this end, self-aligned multiple patterning (SAMP) processes have come to be used to achieve further down scaling. To date, we have demonstrated the effectiveness of self-aligned double patterning (SADP) and self-aligned quadruple patterning (SAQP) as innovative processes and have reported on world-first scaling results at SPIE on several occasions. However, for critical layers in FinFET devices that presume a 1D cell design, there is also a need not just for the scaling of grating patterns but also for line-cutting techniques (grating and cutting). Under the theme of existing- technology extension to sub-10nm logic nodes, this paper presents the potential solutions of sub-10nm hp resolution by self-aligned octuple patterning (SAOP) and discusses the limits of shrink technology in cutting patterns.

  7. Lithographic qualification of high-transmission mask blank for 10nm node and beyond

    NASA Astrophysics Data System (ADS)

    Xu, Yongan; Faure, Tom; Viswanathan, Ramya; Lobb, Granger; Wistrom, Richard; Burns, Sean; Hu, Lin; Graur, Ioana; Bleiman, Ben; Fischer, Dan; Mignot, Yann; Sakamoto, Yoshifumi; Toda, Yusuke; Bolton, John; Bailey, Todd; Felix, Nelson; Arnold, John; Colburn, Matthew

    2016-04-01

    In this paper, we discuss the lithographic qualification of high transmission (High T) mask for Via and contact hole applications in 10nm node and beyond. First, the simulated MEEF and depth of focus (DoF) data are compared between the 6% and High T attnPSM masks with the transmission of High T mask blank varying from 12% to 20%. The 12% High T blank shows significantly better MEEF and larger DoF than those of 6% attnPSM mask blank, which are consistent with our wafer data. However, the simulations show no obvious advantage in MEEF and DoF when the blank transmittance is larger than 12%. From our wafer data, it has been seen that the common process window from High T mask is 40nm bigger than that from the 6% attnPSM mask. In the elongated bar structure with smaller aspect ratio, 1.26, the 12% High T mask shows significantly less develop CD pull back in the major direction. Compared to the High T mask, the optimized new illumination condition for 6% attnPSM shows limited improvement in MEEF and the DoF through pitch. In addition, by using the High T mask blank, we have also investigated the SRAF printing, side lobe printing and the resist profile through cross sections, and no patterning risk has been found for manufacturing. As part of this work new 12% High T mask blank materials and processes were developed, and a brief overview of key mask technology development results have been shared. Overall, it is concluded that the High T mask, 12% transmission, provides the most robust and extendable lithographic solution for 10nm node and beyond.

  8. Scatterometry-based metrology for the 14nm node double patterning lithography

    NASA Astrophysics Data System (ADS)

    Carau, D.; Bouyssou, R.; Ducoté, J.; Dettoni, F.; Ostrovsky, A.; Le Gratiet, B.; Dezauzier, C.; Besacier, M.; Gourgon, C.

    2015-03-01

    Critical dimension and overlay measurements have become a key challenge in microelectronics process control, and the weight of metrology in the success of a patterning technique is increasing. For the 14 nm node, the limit of scanner resolution can be overcome by double patterning, which requires a maximum overlay variability of 3 nm between the two reticles of the first metal level. In the double patterning case of metal layers, critical dimension of line spaces and overlay are no longer independent. In this paper, the possibility of a common measurement after the second lithography is studied. Scatterometry has been used to fit successfully the critical dimension of the two sublevels. As sensitivity to overlay is too low in device-like target, a strategy has been implemented from diffraction-based overlay measurement. So it becomes possible to provide information on the lithography step quality before the second etch process to enable rework if necessary. Finally a scatterometry target has been designed to fit simultaneously the two critical dimensions and overlay. This target, which is designed to maximize overlay sensitivity, has been placed in the next 14 nm CMOS product and is expected to make this scatterometry method even more attractive.

  9. Mask roughness and its implications for LER at the 22- and 16-nm nodes

    SciTech Connect

    Naulleau, Patrick; George, Simi A.; McClinton, Brittany M.

    2010-02-16

    Line-edge roughness (LER) remains the most significant challenge facing the development of extreme ultraviolet (EUV) resist. The mask, however, has been found to be a significant contributor to image-plane LER. This has long been expected based on modeling and has more recently been demonstrated experimentally. Problems arise from both mask-absorber LER as well as mask multilayer roughness leading to random phase variations in the reflected beam and consequently speckle. Understanding the implications this has on mask requirements for the 22-nm half pitch node and below is crucial. Modeling results indicate a replicated surface roughness (RSR) specification of 50 pm and a ruthenium capping layer roughness specification of 440 pm. Moreover, modeling indicates that it is crucial to achieve the current ITRS specifications for mask absorber LER which is significantly smaller than current capabilities.

  10. Materials and fabrication sequences for water soluble silicon integrated circuits at the 90 nm node

    NASA Astrophysics Data System (ADS)

    Yin, Lan; Bozler, Carl; Harburg, Daniel V.; Omenetto, Fiorenzo; Rogers, John A.

    2015-01-01

    Tungsten interconnects in silicon integrated circuits built at the 90 nm node with releasable configurations on silicon on insulator wafers serve as the basis for advanced forms of water-soluble electronics. These physically transient systems have potential uses in applications that range from temporary biomedical implants to zero-waste environmental sensors. Systematic experimental studies and modeling efforts reveal essential aspects of electrical performance in field effect transistors and complementary ring oscillators with as many as 499 stages. Accelerated tests reveal timescales for dissolution of the various constituent materials, including tungsten, silicon, and silicon dioxide. The results demonstrate that silicon complementary metal-oxide-semiconductor circuits formed with tungsten interconnects in foundry-compatible fabrication processes can serve as a path to high performance, mass-produced transient electronic systems.

  11. Enabling the 14nm node contact patterning using advanced RET solutions

    NASA Astrophysics Data System (ADS)

    Zeggaoui, N.; Landie, G.; Villaret, A.; Farys, V.; Yesilada, E.; Tritchkov, A.; Word, J.

    2015-09-01

    The 14nm node designs is getting more sophisticated, and printability issues become more critical which need more advanced techniques to fix. One of the most critical processes is the contact patterning due to the very aggressive design rules and the process window which becomes quickly limited. Despite the large number of RET applied, some hotspot configurations remain challenging. It becomes increasingly challenging to achieve sufficient process windows around the hot spots just using conventional process such as OPC and rule-based SRAF insertion. Although, it might be desirable to apply Inverse Lithography Technique (ILT) on all hot spots to guarantee ideal mask quality. However, because of the high number of hot spots to repair in the design, that solution might be much time consuming in term of OPC and mask processing. In this paper we present a hybrid OPC solution based on local ILT usage around hot spots. It is named as Local Printability Enhancement (LPE) flow. First, conventional OPC and SRAF placement is applied on the whole design. Then, we apply LPE solution only on the remaining problematic hot spots of the design. The LPE flow also takes into account the mask rules so that it maintains the mask rule check (MRC) compliance through the borders of the repaired hot spot's areas. We will demonstrate that the LPE flow enlarges the process window around hot spots and gives better lithography quality than baseline. The simulation results are confirmed on silicon wafer where all the hot spots are printed. We will demonstrate that LPE flow enlarges the depth of focus of the most challenging hot spot by 30nm compared to POR conventional solution. Because the proposed flow applies ILT solution on very local hot spot areas, the total OPC run time remains acceptable from manufacturing side.

  12. Hybrid OPC modeling with SEM contour technique for 10nm node process

    NASA Astrophysics Data System (ADS)

    Hitomi, Keiichiro; Halle, Scott; Miller, Marshal; Graur, Ioana; Saulnier, Nicole; Dunn, Derren; Okai, Nobuhiro; Hotta, Shoji; Yamaguchi, Atsuko; Komuro, Hitoshi; Ishimoto, Toru; Koshihara, Shunsuke; Hojo, Yutaka

    2014-03-01

    Hybrid OPC modeling is investigated using both CDs from 1D and simple 2D structures and contours extracted from complex 2D structures, which are obtained by a Critical Dimension-Scanning Electron Microscope (CD-SEM). Recent studies have addressed some of key issues needed for the implementation of contour extraction, including an edge detection algorithm consistent with conventional CD measurements, contour averaging and contour alignment. Firstly, pattern contours obtained from CD-SEM images were used to complement traditional site driven CD metrology for the calibration of OPC models for both metal and contact layers of 10 nm-node logic device, developed in Albany Nano-Tech. The accuracy of hybrid OPC model was compared with that of conventional OPC model, which was created with only CD data. Accuracy of the model, defined as total error root-mean-square (RMS), was improved by 23% with the use of hybrid OPC modeling for contact layer and 18% for metal layer, respectively. Pattern specific benefit of hybrid modeling was also examined. Resist shrink correction was applied to contours extracted from CD-SEM images in order to improve accuracy of the contours, and shrink corrected contours were used for OPC modeling. The accuracy of OPC model with shrink correction was compared with that without shrink correction, and total error RMS was decreased by 0.2nm (12%) with shrink correction technique. Variation of model accuracy among 8 modeling runs with different model calibration patterns was reduced by applying shrink correction. The shrink correction of contours can improve accuracy and stability of OPC model.

  13. Continuous wave and passively Q-switched laser performance of Nd:LuxGd3-xGa5O12 crystal at 1062 nm

    NASA Astrophysics Data System (ADS)

    Fu, X. W.; Jia, Z. T.; Yang, H.; Li, Y. B.; Yuan, D. S.; Zhang, B. T.; Dong, C. M.; He, J. L.; Tao, X. T.

    2012-12-01

    Continuous wave (CW) and passively Q-switched (PQS) laser properties at 1062 nm of the Nd:LuxGd3-xGa5O12 (Nd:LGGG) disordered crystal have been demonstrated. The doping concentrations of Nd3+ and Lu3+ in the as obtained crystal were measured to be 0.96 and 0.66 at.%, respectively. In the CW regime, the output power of 9.73 W was obtained with an optical-to-optical efficiency as high as 60.7% and slope efficiency of 61.2%. During the passively Q-switched operation, the maximum output power of 1.24 W was achieved under the absorbed pump power of 6.86 W. The maximum peak power of 14.20 kW and single pulse energy of 148 μJ were obtained with the Toc = 10% under the absorbed pump power of 6.36 W. The results are much better than those obtained with Nd:LGGG crystal doped with 13.6 at.% Lu3+ and 0.53 at.% Nd3+ ions.

  14. AltPSM contact hole application at DRAM 4xnm nodes with dry 193nm lithography

    NASA Astrophysics Data System (ADS)

    Noelscher, Christoph; Henkel, Thomas; Jauzion-Graverolle, Franck; Hennig, Mario; Morgana, Nicolo; Schlief, Ralph; Moukara, Molela; Koehle, Roderick; Neubauer, Ralf

    2008-03-01

    To avoid expensive immersion lithography and to further use existing dry tools for critical contact layer lithography at 4Xnm DRAM nodes the application of altPSM is investigated and compared to attPSM. Simulations and experiments with several test masks showed that by use of altPSM with suitable 0°/180° coloring and assist placement 30nm smaller contacts can be resolved through pitch with sufficient process windows (PW). This holds for arrays of contacts with variable lengths through short and long side pitches. A further benefit is the lower mask error enhancement factor (MEEF). Nevertheless 3D mask errors (ME) consume benefits in the PW and the assist placement and coloring of the main features (MF) put some constraints on the chip design. An altPSM compatible 4Xnm full-chip layout was realized without loss of chip area. Mask making showed very convincing results with respect to CDU, etch depth uniformity and defectiveness. The printed intra-field CD uniformity was comparable to attPSM despite the smaller target CDs. Room for improvement is identified in OPC accuracy and in automatic assist placement and sizing.

  15. Defects caused by blank masks and repair solution with nanomachining for 20nm node

    NASA Astrophysics Data System (ADS)

    Lee, HyeMi; Kim, ByungJu; Kim, MunSik; Jung, HoYong; Kim, Sang Pyo; Yim, DongGyu

    2014-09-01

    As the number of masks per wafer product set is increasing and low k1 lithography requires tight mask specifications, the patterning process below sub 20nm tech. node for critical layers will be much more expensive compared with previous tech. generations. Besides, the improved resolution and the zero defect level are necessary to meet tighter specifications on a mask and these resulted in the increased the blank mask price as well as the mask fabrication cost. Unfortunately, in spite of expensive price of blank masks, the certain number of defects on the blank mask is transformed into the mask defects and its ratio is increased. But using high quality blank mask is not a good idea to avoid defects on the blank mask because the price of a blank mask is proportional to specifications related to defect level. Furthermore, particular defects generated from the specific process during manufacturing a blank mask are detected as a smaller defect than real size by blank inspection tools because of its physical properties. As a result, it is almost impossible to prevent defects caused by blank masks during the mask manufacturing. In this paper, blank defect types which is evolved into mask defects and its unique characteristics are observed. Also, the repair issues are reviewed such as the pattern damage according to the defect types and the repair solution is suggested to satisfy the AIMS (Arial Image Measurement System) specification using a nanomachining tool.

  16. Device parameter optimization for sub-20 nm node HK/MG-last bulk FinFETs

    NASA Astrophysics Data System (ADS)

    Miao, Xu; Huaxiang, Yin; Huilong, Zhu; Xiaolong, Ma; Weijia, Xu; Yongkui, Zhang; Zhiguo, Zhao; Jun, Luo; Hong, Yang; Chunlong, Li; Lingkuan, Meng; Peizhen, Hong; Jinjuan, Xiang; Jianfeng, Gao; Qiang, Xu; Wenjuan, Xiong; Dahai, Wang; Junfeng, Li; Chao, Zhao; Dapeng, Chen; Simon, Yang; Tianchun, Ye

    2015-04-01

    Sub-20 nm node bulk FinFET PMOS devices with an all-last high-k/metal gate (HK/MG) process are fabricated and the influence of a series of device parameters on the device scaling is investigated. The high and thin Fin structure with a tapered sidewall shows better performance than the normal Fin structure. The punch through stop layer (PTSL) and source drain extension (SDE) doping profiles are carefully optimized. The device without SDE annealing shows a larger drive current than that with SDE annealing due to better Si crystal regrowth in the amorphous Fin structure after source/drain implantation. The band-edged MG has a better short channel effect immunity, but the lower effective work function (EWF) MG shows a larger driveability. A tradeoff choice for different EWF MGs should be carefully designed for the device's scaling. Project supported by the National 02 IC Projects and the Opening Project of Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences.

  17. Lithographic imaging-driven pattern edge placement errors at the 10-nm node

    NASA Astrophysics Data System (ADS)

    Tyminski, Jacek K.; Sakamoto, Julia A.; Palmer, Shane R.; Renwick, Stephen P.

    2016-04-01

    As new microelectronic designs are being developed, the demands on image overlay and pattern dimension control are compounded by requirements that pattern edge placement errors (EPEs) be at a single-nanometer levels. Scanner performance plays a key role in determining location of the pattern edges at different device layers, not only through overlay but also through imaging performance. The imaging contributes to edge displacement through the variations of the image dimensions and by shifting the images from their target locations. We discuss various aspects of advanced image control relevant to a 10-nm node integrated circuit design. We review a range of issues of pattern edge placement directly linked to pattern imaging. We analyze the impact of different pattern design and scanner-related edge displacement drivers. We present two examples of imaging strategies to pattern logic device metal layer cuts. We analyze EPEs of the cut images resulting from optimized layout design and scanner setup, and we draw conclusions on edge placement control versus imaging performance requirements.

  18. Model based multilayers fix for litho hotspots beyond 20nm node

    NASA Astrophysics Data System (ADS)

    Rabie, Asmaa; Madkour, Kareem; George, Kirolos; ElManhawy, Wael; Brunet, Jean-Marie; Kwan, Joe

    2014-03-01

    Sub-20nm node designs are getting more sophisticated, and printability issues become more critical which need more advanced techniques to fix. It is mandatory for designers to run lithography checks before tapeout, and it is very challenging to fix all of the generated hotspots manually without introducing unintentional hotspots, or DPT violations. This paper presents a methodology for fixing hotspots on DPT layouts, using the same Model Based Hints (MBH) engine used for detecting hotspots. The fix is based on DRC and DPT constrained minimum movement of edges causing the hotspot, which guarantees that the fix does not violate any of the specified DRC or DPT constraints, nor does it need recoloring. The fix is extended along multilayers to fulfill the specified DRC and DPT constraints and guarantees circuit connectivity along the layers stack. This multilayers approach fixes hotspots that were impossible to fix previously. This methodology is demonstrated on industrial designs, where real hotspots were fixed and the fixing rate is reported.

  19. Evaluation of ArF lithography for 45-nm node implant layers

    NASA Astrophysics Data System (ADS)

    Bailey, T. C.; Maynollo, J.; Perez, J. J.; Popova, I.; Zhang, B.

    2007-03-01

    Scaling of designs to the 45nm or future nodes presents challenges for KrF lithography. The purpose of this work was to explore several aspects of ArF lithography for implant layers. A comparison of dark loss seen in a KrF resist and TARC system to that seen in an ArF system showed significant differences. While the KrF resist yielded dark loss that varied with CD and pitch, the ArF resist showed very little dark loss and no significant variation through the design space. ArF resist were observed to have marginal adhesion to various substrates. Improvements in adhesion performance were shown by pre-treating the substrate with various processes, of which an ozone clean provided the best results. Optimization of the HMDS priming conditions also improved adhesion, and it was observed that the HMDS reaction proceeds at different rates on different subsatrates, which is particularly important for implant layers where the resist must adhere to both Si and SiO II. The effect of ArF resist profile with varying reflectivity swing position is shown, and some investigation into reflectivity optimization techniques was performed. Low-index ArF TARC was shown to reduce the CD variation over polysilicon topography, and wet developable BARC was demonstrated to provide consistent profiles on both Si and SiO II substrates. Finally, a comparison of ArF and KrF resists after As implant indicates that the ArF resist showed similar shrinkage performance to the KrF resist.

  20. Estimate design sensitivity to process variation for the 14nm node

    NASA Astrophysics Data System (ADS)

    Landié, Guillaume; Farys, Vincent

    2016-03-01

    Looking for the highest density and best performance, the 14nm technological node saw the development of aggressive designs, with design rules as close as possible to the limit of the process. Edge placement error (EPE) budget is now tighter and Reticle Enhancement Techniques (RET) must take into account the highest number of parameters to be able to get the best printability and guaranty yield requirements. Overlay is a parameter that must be taken into account earlier during the design library development to avoid design structures presenting a high risk of performance failure. This paper presents a method taking into account the overlay variation and the Resist Image simulation across the process window variation to estimate the design sensitivity to overlay. Areas in the design are classified with specific metrics, from the highest to the lowest overlay sensitivity. This classification can be used to evaluate the robustness of a full chip product to process variability or to work with designers during the design library development. The ultimate goal is to evaluate critical structures in different contexts and report the most critical ones. In this paper, we study layers interacting together, such as Contact/Poly area overlap or Contact/Active distance. ASML-Brion tooling allowed simulating the different resist contours and applying the overlay value to one of the layers. Lithography Manufacturability Check (LMC) detectors are then set to extract the desired values for analysis. Two different approaches have been investigated. The first one is a systematic overlay where we apply the same overlay everywhere on the design. The second one is using a real overlay map which has been measured and applied to the LMC tools. The data are then post-processed and compared to the design target to create a classification and show the error distribution. Figure:

  1. Model-based assist feature placement for 32nm and 22nm technology nodes using inverse mask technology

    NASA Astrophysics Data System (ADS)

    Poonawala, Amyn; Painter, Benjamin; Kerchner, Chip

    2009-10-01

    Inverse imaging has been long known to provide a true mathematical solution to the mask design problem. However, it is often times marred by problems like high run-time, mask manufacturability costs, and non-invertible models. In this paper, we propose a mask synthesis flow for advanced lithography nodes, which capitalizes on the inverse mask solution while still overcoming all the above problems. Our technique uses inverse mask technology (IMT) to calculate an inverse mask field containing all the useful information about the AF solution. This field is fed to a polygon placement algorithm to obtain initial AF placements, which are then cooptimized with the main features during an OPC/AF print-fix routine to obtain the final mask solution. The proposed flow enables process window maximization via IMT while guaranteeing fully MRC compliant masks. We present several results demonstrating the superiority of this approach. We also compare our IMT-AFs with the best AF solution obtained using extensive brute-force search (via a first principles simulator, S-litho), and prove that our solution is optimum.

  2. The performances of different overlay mark types at 65nm node on 300-mm wafers

    NASA Astrophysics Data System (ADS)

    Tseng, H. T.; Lin, Ling-Chieh; Huang, I. H.; Lin, Benjamin S.; Huang, Chin-Chou K.; Huang, Chien-Jen

    2005-05-01

    The integrated circuit (IC) manufacturing factories have measured overlay with conventional "box-in-box" (BiB) or "frame-in-frame" (FiF) structures for many years. Since UMC played as a roll of world class IC foundry service provider, tighter and tighter alignment accuracy specs need to be achieved from generation to generation to meet any kind of customers' requirement, especially according to International Technology Roadmap for Semiconductors (ITRS) 2003 METROLOGY section1. The process noises resulting from dishing, overlay mark damaging by chemical mechanism polishing (CMP), and the variation of film thickness during deposition are factors which can be very problematic in mark alignment. For example, the conventional "box-in-box" overlay marks could be damaged easily by CMP, because the less local pattern density and wide feature width of the box induce either dishing or asymmetric damages for the measurement targets, which will make the overlay measurement varied and difficult. After Advanced Imaging Metrology (AIM) overlay targets was introduced by KLA-Tencor, studies in the past shown AIM was more robust in overlay metrology than conventional FiF or BiB targets. In this study, the applications of AIM overlay marks under different process conditions will be discussed and compared with the conventional overlay targets. To evaluate the overlay mark performance against process variation on 65nm technology node in 300-mm wafer, three critical layers were chosen in this study. These three layers were Poly, Contact, and Cu-Metal. The overlay targets used for performance comparison were BiB and Non-Segmented AIM (NS AIM) marks. We compared the overlay mark performance on two main areas. The first one was total measurement uncertainty (TMU)3 related items that include Tool Induced Shift (TIS) variability, precision, and matching. The other area is the target robustness against process variations. Based on the present study AIM mark demonstrated an equal or better

  3. Data preparation solution for e-beam multiple pass exposure: reaching sub-22nm nodes with a tool dedicated to 45 nm

    NASA Astrophysics Data System (ADS)

    Martin, Luc; Manakli, Serdar; Bayle, Sébastien; Choi, Kang-Hoon; Gutsch, Manuela; Pradelles, Jonathan; Bustos, Jessy

    2011-04-01

    Electron Beam Direct Write (EBDW) lithography is used in the IC manufacturing industry to sustain optical lithography for prototyping applications and low volume manufacturing. It is also used in R&D to develop advanced technologies, ahead of mass production. As microelectronics is now moving towards the 32nm node and beyond, the specifications in terms of dimension control and roughness becomes tighter. In addition, the shrink of the size and pitch of features significantly reduces the process window of lithographic tools. In EBDW, the standard proximity effects corrections only based on dose modulation show difficulties to provide the required Energy Latitude for patterning structures designed below 45nm. A new approach is thus needed to improve the process window of EBDW lithography and push its resolution capabilities. In previous papers, a new writing strategy based on multiple pass exposure has been introduced and optimized to pattern critical dense lines. This new technique consists in adding small electron Resolution Improvement Features (eRIFs) on top of the nominal structures. Then this new design is exposed in two successive passes with optimized doses. Previous studies were led to evaluate this new writing technique and establish rules to optimize the design of the eRIF. Significant improvements have already been demonstrated on SRAM and Logic structures down to the 16nm node. These results were obtained with a tool dedicated to the 45nm node. The next step of this work is thus to automatically implement the eRIF to correct large-scale layouts. In this paper, a new data preparation flow is set up for EBDW lithography. It uses the eRIF solution as a full advanced correction method for critical structures. The specific correction rules established in our previous studies are implemented to improve the CD control and the patterning of corners and line ends. Moreover, the dose and shape of the eRIFs are automatically tuned to best fit the nominal design

  4. Implementation of double dipole lithography for 45-nm node poly and diffusion layer manufacturing with 0.93NA

    NASA Astrophysics Data System (ADS)

    Wu, Meng-Hsiu; Hsu, Michael; Hsu, Stephen; Lu, Bo-Jou; Cheng, Yung-Feng; Chou, Yueh-Lin; Yang, Chuen-Huei

    2007-05-01

    The double dipole lithography (DDL) has been proven to be one of the resolution enhancement technologies for 45 nm node. In this paper, we have implemented a full-chip DDL process for 45nm node using ArF immersion lithography. Immersion exposure system can effectively enlarge the process DoF (depth of focus). Combining with dipole illumination can help us to reach smaller k1 value (~0.31) and meet the process requirements of poly and diffusion layers on 45nm node by using only 0.93 NA exposure tool. However, from a full-chip processing point of view, the more challenging question should be: how to calibrate a good model from two exposure and decompose original design to separate mask sets? Does the image performance achieve a production worthy standard? At 45nm node, we are using one-fourth of the exposure wavelength for the patterning; there is very little room for error. For DDL full-chip processing, we need a robust application strategy to ensure a very tight CD control. We implemented an integrated RET solution that combines DDL along with polarization, immersion system, and model based OPC to meet full-chip manufacturing requirement. This is to be a dual-exposure mask solution for 45nm node - X-dipole exposure for vertical mask and horizontal for Y-dipole. We show a process design flow starting from the design rule analysis, layout decomposition, model-based OPC, manufacturing reliability check, and then to the mask data preparation. All of the work has been implemented using MaskWeaver TM geometry engine. Additionally, we investigated printability for through-pitch line features, ASIC logic, and SRAM cell design patterns. Different circuit layout needs dedicated special OPC treatment. To characterize the related process performance, we use mask enhancement error factor (MEEF), process window (PW), and critical dimension uniformity (CDU) to analyze the simulation data. Since we used the tri-tone Att-PSM, the mask making flow and spec was also taking into

  5. DOE experiment for scattering bars optimization at the 90nm node

    NASA Astrophysics Data System (ADS)

    Bouton, G.; Connolly, B.; Courboin, D.; Di Giacomo, A.; Gasnier, F.; Lallement, R.; Parker, D.; Pindo, M.; Richoilley, J. C.; Royere, F.; Rameau-Savio, A.; Tissier, M.

    2011-03-01

    Scattering bars (SB) are sub-resolution lines added to the original database during Resolution Enhancement Techniques (RET) treatments. Their goal is stabilizing the CD of the adjacent polygons (by suppressing or reducing secondary diffraction waves). SB increase the process window in the litho process by lowering the first derivative of the CD. Moreover, the detailed knowledge of SB behavior around the fab working point is a must for future shrinks and for preparing the next technology nodes. SB are inserted in the generation of critical levels for STMicroelectronics 90 nm technology embedded memories before invoking the Model for Optical Proximity Corrections (MBOPC). This allows the software to calculate their contribution to the intensity in the aerial image and integrate their effects in Edge Proximity Error (EPE) corrections. However the Rule-Based insertion of these assist features still leaves behind occurrences of conflicting priorities as in the image below. (See manuscript PDF)Detection of Hot Spots in 2D simulations for die treatment validation (done on BRION equipment on each critical level before mask making) is in most cases correlated with SB singularities, at least for CD non-uniformity, bridging issues and necking in correspondence with OPC fragmentation effects. Within the framework of the MaXSSIMM project, we established a joint STMicroelectronics and Toppan Photomasks team to explore the influence of assist features (CD, distance), convex and concave corner rounding and CD uniformity by means of specific test patterns. The proposed study concerns the algorithms used to define the mask shop input as well as the physical mask etching. A set of test cases, based on elementary test patterns, each one including a list of geometrical variations, has been defined. As the number of configurations becomes rapidly very large (tens of thousands) we had to apply Design of Experiments (DOE) algorithms in order to reduce the number of measurements to a

  6. Nodes

    NASA Technical Reports Server (NTRS)

    Hanson, John; Martinez, Andres; Petro, Andrew

    2015-01-01

    Nodes is a technology demonstration mission that is scheduled for launch to the International SpaceStation no earlier than Nov.19, 2015. The two Nodes satellites will be deployed from the Station in early 2016 todemonstrate new network capabilities critical to the operation of swarms of spacecraft. They will demonstrate the ability ofmulti spacecraft swarms to receive and distribute ground commands, exchange information periodically, andautonomously configure the network by determining which spacecraft should communicate with the ground each day ofthe mission.

  7. Direct strain measurement in a 65 nm node strained silicon transistor by convergent-beam electron diffraction

    SciTech Connect

    Zhang, Peng; Istratov, Andrei A.; Weber, Eicke R.; Kisielowski, Christian; He, Haifeng; Nelson, Chris; Spence, John C.H

    2006-01-01

    Using the energy-filtered convergent-beam electron diffraction !CBED" technique in a transmission electron microscope, the authors report here a direct measurement of the lattice parameters of uniaxially strained silicon as close as 25 nm below the gate in a 65 nm node p-type metal-oxide-semiconductor field-effect transistor with SiGe source and drain. It is found that the dominant strain component (0.58%) is compressive along the source-drain direction. The compressive stress is 1.1 GPa along this direction. These findings demonstrate that CBED can serve as a strain metrology technique for the development of strained silicon device technology

  8. An investigation into scalability and compliance for triple patterning with stitches for metal 1 at the 14nm node

    NASA Astrophysics Data System (ADS)

    Cork, Christopher; Miloslavsky, Alexander; Friedberg, Paul; Luk-Pat, Gerry

    2013-04-01

    Lithographers had hoped that single patterning would be enabled at the 20nm node by way of EUV lithography. However, due to delays in EUV readiness, double patterning with 193i lithography is currently relied upon for volume production for the 20nm node's metal 1 layer. At the 14nm and likely at the 10nm node, LE-LE-LE triple patterning technology (TPT) is one of the favored options [1,2] for patterning local interconnect and Metal 1 layers. While previous research has focused on TPT for contact mask, metal layers offer new challenges and opportunities, in particular the ability to decompose design polygons across more than one mask. The extra flexibility offered by the third mask and ability to leverage polygon stitching both serve to improve compliance. However, ensuring TPT compliance - the task of finding a 3-color mask decomposition for a design - is still a difficult task. Moreover, scalability concerns multiply the difficulty of triple patterning decomposition which is an NP-complete problem. Indeed previous work shows that network sizes above a few thousand nodes or polygons start to take significantly longer times to compute [3], making full chip decomposition for arbitrary layouts impractical. In practice Metal 1 layouts can be considered as two separate problem domains, namely: decomposition of standard cells and decomposition of IP blocks. Standard cells typically include only a few 10's of polygons and should be amenable to fast decomposition. Successive design iterations should resolve compliance issues and improve packing density. Density improvements are multiplied repeatedly as standard cells are placed multiple times. IP blocks, on the other hand, may involve very large networks. This paper evaluates multiple approaches to triple patterning decomposition for the Metal 1 layer. The benefits of polygon stitching, in particular, the ability to resolve commonly encountered non-compliant layout configurations and improve packing density, are weighed

  9. Integration of e-beam direct write in BEOL processes of 28nm SRAM technology node using mix and match

    NASA Astrophysics Data System (ADS)

    Gutsch, Manuela; Choi, Kang-Hoon; Hanisch, Norbert; Hohle, Christoph; Seidel, Robert; Steidel, Katja; Thrun, Xaver; Werner, Thomas

    2014-10-01

    Many efforts were spent in the development of EUV technologies, but from a customer point of view EUV is still behind expectations. In parallel since years maskless lithography is included in the ITRS roadmap wherein multi electron beam direct patterning is considered as an alternative or complementary approach for patterning of advanced technology nodes. The process of multi beam exposures can be emulated by single beam technologies available in the field. While variable shape-beam direct writers are already used for niche applications, the integration capability of e-beam direct write at advanced nodes has not been proven, yet. In this study the e-beam lithography was implemented in the BEoL processes of the 28nm SRAM technology. Integrated 300mm wafers with a 28nm back-end of line (BEoL) stack from GLOBALFOUNDRIES, Dresden, were used for the experiments. For the patterning of the Metal layer a Mix and Match concept based on the sequence litho - etch - litho - etch (LELE) was developed and evaluated wherein several exposure fields were blanked out during the optical exposure. E-beam patterning results of BEoL Metal and Via layers are presented using a 50kV VISTEC SB3050DW variable shaped electron beam direct writer at Fraunhofer IPMS-CNT. Etch results are shown and compared to the POR. In summary we demonstrate the integration capability of EBDW into a productive CMOS process flow at the example of the 28nm SRAM technology node.

  10. Practical proof of CP element based design for 14nm node and beyond

    NASA Astrophysics Data System (ADS)

    Maruyama, Takashi; Takita, Hiroshi; Ikeno, Rimon; Osawa, Morimi; Kojima, Yoshinori; Sugatani, Shinji; Hoshino, Hiromi; Hino, Toshio; Ito, Masaru; Iizuka, Tetsuya; Komatsu, Satoshi; Ikeda, Makoto; Asada, Kunihiro

    2013-03-01

    To realize HVM (High Volume Manufacturing) with CP (Character Projection) based EBDW, the shot count reduction is the essential key. All device circuits should be composed with predefined character parts and we call this methodology "CP element based design". In our previous work, we presented following three concepts [2]. 1) Memory: We reported the prospects of affordability for the CP-stencil resource. 2) Logic cell: We adopted a multi-cell clustering approach in the physical synthesis. 3) Random interconnect: We proposed an ultra-regular layout scheme using fixed size wiring tiles containing repeated tracks and cutting points at the tile edges. In this paper, we will report the experimental proofs in these methodologies. In full chip layout, CP stencil resource management is critical key. From the MCC-POC (Proof of Concept) result [1], we assumed total available CP stencil resource as 9000um2. We should manage to layout all circuit macros within this restriction. Especially the issues in assignment of CP-stencil resource for the memory macros are the most important as they consume considerable degree of resource because of the various line-ups such as 1RW-, 2RW-SRAMs, Resister Files and ROM which require several varieties of large size peripheral circuits. Furthermore the memory macros typically take large area of more than 40% of die area in the forefront logic LSI products so that the shot count increase impact is serious. To realize CP-stencil resource saving we had constructed automatic CP analyzing system. We developed two types of extraction mode of simple division by block and layout repeatability recognition. By properly controlling these models based upon each peripheral circuit characteristics, we could minimize the consumption of CP stencil resources. The estimation for 14nm technology node had been performed based on the analysis of practical memory compiler. The required resource for memory macro is proved to be affordable value which is 60% of full

  11. Extreme ultraviolet mask defect inspection with a half pitch 16-nm node using simulated projection electron microscope images

    NASA Astrophysics Data System (ADS)

    Iida, Susumu; Amano, Tsuyoshi; Hirano, Ryoichi; Terasawa, Tsuneo; Watanabe, Hidehiro

    2013-04-01

    According to an International Technology Roadmap for Semiconductors (ITRS-2012) update, the sensitivity requirement for an extreme ultraviolet (EUV) mask pattern inspection system is to be less than 18 nm for half pitch (hp) 16-nm node devices. The inspection sensitivity of extrusion and intrusion defects on hp 64-nm line-and-space patterned EUV mask were investigated using simulated projection electron microscope (PEM) images. The obtained defect images showed that the optimization of current density and image processing techniques were essential for the detection of defects. Extrusion and intrusion defects 16 nm in size were detected on images formed by 3000 electrons per pixel. The landing energy also greatly influenced the defect detection efficiency. These influences were different for extrusion and intrusion defects. These results were in good agreement with experimentally obtained yield curves of the mask materials and the elevation angles of the defects. These results suggest that the PEM technique has a potential to detect 16-nm size defects on an hp 64-nm patterned EUV mask.

  12. DSA patterning options for FinFET formation at 7nm node

    NASA Astrophysics Data System (ADS)

    Liu, Chi-Chun C.; Franke, Elliott; Lie, Fee Li; Sieg, Stuart; Tsai, Hsinyu; Lai, Kafai; Truong, Hoa; Farrell, Richard; Somervell, Mark; Sanders, Daniel; Felix, Nelson; Guillorn, Michael; Burns, Sean; Hetzer, David; Ko, Akiteru; Arnold, John; Colburn, Matthew

    2016-03-01

    Several 27nm-pitch directed self-assembly (DSA) processes targeting fin formation for FinFET device fabrication are studied in a 300mm pilot line environment, including chemoepitaxy for a conventional Fin arrays, graphoepitaxy for a customization approach and a hybrid approach for self-aligned Fin cut. The trade-off between each DSA flow is discussed in terms of placement error, Fin CD/profile uniformity, and restricted design. Challenges in pattern transfer are observed and process optimization are discussed. Finally, silicon Fins with 100nm depth and on-target CD using different DSA options with either lithographic or self-aligned customization approach are demonstrated.

  13. Minimizing linewidth roughness for 22-nm node patterning with step-and-flash imprint lithography

    NASA Astrophysics Data System (ADS)

    Schmid, Gerard M.; Khusnatdinov, Niyaz; Brooks, Cynthia B.; LaBrake, Dwayne; Thompson, Ecron; Resnick, Douglas J.

    2008-03-01

    Imprint lithography achieves high resolution patterning with low roughness by avoiding the tradeoff between pattern quality and process throughput - a tradeoff that limits the capability of photolithography with chemically amplified resists. This work demonstrates the use of ZEP520A electron-beam resist for fabrication of imprint masks (templates). It is shown that high resolution, low roughness patterns can be robustly transferred from imprint mask to imprint resist, and from imprint resist through etch transfer into the underlying substrate. Through improvements to the electron-beam patterning process, 22 nm half-pitch patterns are routinely achieved with linewidth roughness (LWR) of just 2.6 nm, 3σ

  14. Photon flux requirements for EUV reticle imaging microscopy in the 22 and 16 nm nodes

    SciTech Connect

    Wintz, D.; Goldberg, K. A.; Mochi, I.; Huh, S.

    2010-03-12

    EUV-wavelength actinic microscopy yields detailed information about EUV mask patterns, architectures, defects, and the performance of defect repair strategies, without the complications of photoresist imaging. The measured aerial image intensity profiles provide valuable feedback to improve mask and lithography system modeling methods. In order to understand the photon-flux-dependent pattern measurement limits of EUV mask-imaging microscopy, we have investigated the effects of shot noise on aerial image linewidth measurements for lines in the 22 and 16-nm generations. Using a simple model of image formation near the resolution limit, we probe the influence of photon shot noise on the measured, apparent line roughness. With this methodology, we arrive at general flux density requirements independent of the specific EUV microscope configurations. Analytical and statistical analysis of aerial image simulations in the 22 and 16-nm generations reveal the trade-offs between photon energy density (controllable with exposure time), effective pixel dimension on the CCO (controlled by the microscope's magnification ratio), and image log slope (ILS). We find that shot-noise-induced linewidth roughness (LWR) varies imersely with the square root of the photon energy density, and is proportional to the imaging magnification ratio. While high magnification is necessary for adequate spatial resolution, for a given flux density, higher magnification ratios have diminishing benefits. With practical imaging parameters, we find that in order to achieve an LWR (3{sigma}) value of 5% of linewidth for dense, 88-nm mask features with 80% aerial image contrast and 13.5-nm effective pixel width (1000x magnification ratio), a peak photon flux of approximately 1400 photons per pixel per exposure is required.

  15. Accurate mask model implementation in optical proximity correction model for 14-nm nodes and beyond

    NASA Astrophysics Data System (ADS)

    Zine El Abidine, Nacer; Sundermann, Frank; Yesilada, Emek; Farys, Vincent; Huguennet, Frederic; Armeanu, Ana-Maria; Bork, Ingo; Chomat, Michael; Buck, Peter; Schanen, Isabelle

    2016-04-01

    In a previous work, we demonstrated that the current optical proximity correction model assuming the mask pattern to be analogous to the designed data is no longer valid. An extreme case of line-end shortening shows a gap up to 10 nm difference (at mask level). For that reason, an accurate mask model has been calibrated for a 14-nm logic gate level. A model with a total RMS of 1.38 nm at mask level was obtained. Two-dimensional structures, such as line-end shortening and corner rounding, were well predicted using scanning electron microscopy pictures overlaid with simulated contours. The first part of this paper is dedicated to the implementation of our improved model in current flow. The improved model consists of a mask model capturing mask process and writing effects, and a standard optical and resist model addressing the litho exposure and development effects at wafer level. The second part will focus on results from the comparison of the two models, the new and the regular.

  16. Accurate mask model implementation in OPC model for 14nm nodes and beyond

    NASA Astrophysics Data System (ADS)

    Zine El Abidine, Nacer; Sundermann, Frank; Yesilada, Emek; Farys, Vincent; Huguennet, Frederic; Armeanu, Ana-Maria; Bork, Ingo; Chomat, Michael; Buck, Peter; Schanen, Isabelle

    2015-10-01

    In a previous work [1] we demonstrated that current OPC model assuming the mask pattern to be analogous to the designed data is no longer valid. Indeed as depicted in figure 1, an extreme case of line-end shortening shows a gap up to 10 nm difference (at mask level). For that reason an accurate mask model, for a 14nm logic gate level has been calibrated. A model with a total RMS of 1.38nm at mask level was obtained. 2D structures such as line-end shortening and corner rounding were well predicted using SEM pictures overlaid with simulated contours. The first part of this paper is dedicated to the implementation of our improved model in current flow. The improved model consists of a mask model capturing mask process and writing effects and a standard optical and resist model addressing the litho exposure and development effects at wafer level. The second part will focus on results from the comparison of the two models, the new and the regular, as depicted in figure 2.

  17. Process variation challenges and resolution in the negative-tone develop double patterning for 20nm and below technology node

    NASA Astrophysics Data System (ADS)

    Mehta, Sohan S.; Ganta, Lakshmi K.; Chauhan, Vikrant; Wu, Yixu; Singh, Sunil; Ann, Chia; Subramany, Lokesh; Higgins, Craig; Erenturk, Burcin; Srivastava, Ravi; Singh, Paramjit; Koh, Hui Peng; Cho, David

    2015-03-01

    Immersion based 20nm technology node and below becoming very challenging to chip designers, process and integration due to multiple patterning to integrate one design layer . Negative tone development (NTD) processes have been well accepted by industry experts for enabling technologies 20 nm and below. 193i double patterning is the technology solution for pitch down to 80 nm. This imposes tight control in critical dimension(CD) variation in double patterning where design patterns are decomposed in two different masks such as in litho-etch-litho etch (LELE). CD bimodality has been widely studied in LELE double patterning. A portion of CD tolerance budget is significantly consumed by variations in CD in double patterning. The objective of this work is to study the process variation challenges and resolution in the Negative Tone Develop Process for 20 nm and Below Technology Node. This paper describes the effect of dose slope on CD variation in negative tone develop LELE process. This effect becomes even more challenging with standalone NTD developer process due to q-time driven CD variation. We studied impact of different stacks with combination of binary and attenuated phase shift mask and estimated dose slope contribution individually from stack and mask type. Mask 3D simulation was carried out to understand theoretical aspect. In order to meet the minimum insulator requirement for the worst case on wafer the overlay and critical dimension uniformity (CDU) budget margins have slimmed. Besides the litho process and tool control using enhanced metrology feedback, the variation control has other dependencies too. Color balancing between the two masks in LELE is helpful in countering effects such as iso-dense bias, and pattern shifting. Dummy insertion and the improved decomposition techniques [2] using multiple lower priority constraints can help to a great extent. Innovative color aware routing techniques [3] can also help with achieving more uniform density and

  18. Design verification for sub-70-nm DRAM nodes via metal fix using E-beam direct write

    NASA Astrophysics Data System (ADS)

    Keil, K.; Jaschinsky, P.; Hohle, C.; Choi, K.-H.; Schneider, R.; Tesauro, M.; Thrum, F.; Zimmermann, R.; Kretz, J.

    2009-01-01

    Because of mask cost reduction, electron beam direct write (EBDW) is implemented for special applications such as rapid prototyping or small volume production in semiconductor industry. One of the most promising applications for EBDW is design verification by means of metal fix. Due to write time constrains, Mix & Match solutions have to be developed at smaller nodes. This study reports on several Mix and Match processes for the integration of E-Beam lithography into the optical litho process flow of Qimonda's 70 nm and 58 nm DRAM nodes. Different metal layers have been patterned in part with DUV litho followed by E-Beam litho using a 50 kV Vistec SB3050 shaped electron beam direct writer. All hardmask patterns were then simultaneously transferred into the DRAM stack. After full chip processing a yield study comprising electrical device characterization and defect investigation was performed. We show detailed results including CD and OVL as well as improvements of the alignment mark recognition. The yield of the E-Beam processed chips was found to be within the range of wafer-to-wafer fluctuation of the POR hardware. We also report on metal fix by electrical cutting of selected diodes in large chip scales which usually cannot be accessed with FIB methods. In summary, we show the capability of EBDW for quick and flexible design verification.

  19. Impact of EUV patterning scenario on different design styles and their ground rules for 7nm/5nm node BEOL layers

    NASA Astrophysics Data System (ADS)

    Chiou, Tsann-Bim; Chen, Alek C.; Dusa, Mircea; Tseng, Shih-En

    2016-03-01

    As the IC industry moves forward to 7nm or 5nm node, the minimum pitch of back-end-of-line (BEOL) layers could be near 30nm. Extreme ultraviolet (EUV) could be the most cost effective solution for patterning critical metal and via layers. Patterning of the critical layers would need greater than 4x exposures using ArFi lithography, leading to severe cost and yield issues. There are two potential design options, one-dimension (1D) and two-dimension (2D), for metal 1 layer. EUV's single exposure option offers superior image quality especially for the 2D design style, but scalability of a 2D design is limited by EUV with a fixed numerical aperture (NA). The single exposure of EUV is an appropriate patterning solution for printing a 1D design directly, but maintaining critical dimension uniformity (CDU) of lines and line-ends is a challenge. Scalability of the 1D design is also limited by the single exposure option. The 1D design can be patterned through a spacer film deposition to gain superior line CD control, followed by printing a cut or block pattern to create the line-ends. Since the minimum pitch of cut/block patterns is generally larger than the metal pitch, EUV's single exposure option has a potential to print the cut/block pattern at smaller pitch and resolution and offers an opportunity to further design shrink. An elongated via design helps design scalability due to an insensitive overlay error contribution to via-to-metal contact area and encroachment.

  20. Evaluation of compact models for negative-tone development layers at 20/14nm nodes

    NASA Astrophysics Data System (ADS)

    Chen, Ao; Foong, Yee Mei; Zhang, Dong Qing; Zhang, Hongxin; Chung, Angeline; Fryer, David; Deng, Yunfei; Medvedev, Dmitry; Granik, Yuri

    2015-03-01

    With the introduction of negative tone develop (NTD) resists to production lithography nodes, multiple NTD resist modeling challenges have surpassed the accuracy limits of the existing modeling infrastructure developed for the positive polarity process. We report the evaluation of two NTD resist modeling algorithms. The new modeling terms represent, from the first principles, the NTD resist mechanisms of horizontal shrink and horizontal development bias. Horizontal shrink describes the impact of the physical process of out-gassing on remaining resist edge location. Horizontal development bias accounts for the differential in the peak and minimum development rate with exposure intensity observed in NTD formulations. We review specific patterning characteristics by feature type, modeling accuracy impact presented by these NTD mechanisms, and their description in our compact models (Compact Model 1, CM1). All the new terms complement the accuracy advantage observed with existing CM1 resist modeling infrastructure. The new terms were tested on various NTD layers. The results demonstrate consistent model accuracy improvement for both calibration and verification. Furthermore, typical NTD model fitting challenges, such as large SRAF-induced wafer CD jump, can be overcome by the new NTD terms. Finally, we propose a joint-tuning approach for the calibration of compact models for the NTD resist.

  1. Evaluation of lens heating effect in high transmission NTD processes at the 20nm technology node

    NASA Astrophysics Data System (ADS)

    Jeon, Bumhwan; Lee, Sam; Subramany, Lokesh; Li, Chen; Pal, Shyam; Meyers, Sheldon; Mehta, Sohan; Wei, Yayi; Cho, David R.

    2014-04-01

    The NTD (Negative Tone Developer) process has been embraced as a viable alternative to traditionally, more conventional, positive tone develop processes. Advanced technology nodes have necessitated the adopting of NTD processes to achieve such tight design specifications in critical dimensions. Dark field contact layers are prime candidates for NTD processing due to its high imaging contrast. However, reticles used in NTD processes are highly transparent. The transmission rate of those masks can be over 85%. Consequently, lens heating effects result in a non-trivial impact that can limit NTD usability in a high volume mass production environment. At the same time, Source Mask Optimized (SMO) freeform pupils have become popular. This can also result in untoward lens heating effects which are localized in the lens. This can result in a unique drift behavior with each Zernike throughout the exposing of wafers. In this paper, we present our experience and lessons learned from lens heating with NTD processes. The results of this study indicate that lens heating makes impact on drift behavior of each Zernike during exposure while source pupil shape make an impact on the amplitude of Zernike drift. Existing lens models should be finely tuned to establish the correct compensation for drift. Computational modeling for lens heating can be considered as one of these opportunities. Pattern shapes, such as dense and iso pattern, can have different drift behavior during lens heating.

  2. Advanced gate CDU control in sub-28nm node using poly slot process by scatterometry metrology

    NASA Astrophysics Data System (ADS)

    Tzai, Wei-Jhe; Chen, Howard; Lin, Jun-Jin; Huang, Yu-Hao; Yu, Chun-Chi; Lin, Ching-Hung Bert; Yoo, Sungchul; Huang, Chien-Jen Eros; Mihardja, Lanny

    2013-04-01

    Scatterometry-based metrology is a well proven method to measure and monitor the critical dimensions of interest in advanced sub-28nm process development and high volume manufacturing [1][3][4][6][7]. In this paper, a proposed solution to control and achieve the optimal gate critical dimension uniformity (CDU) was explored. The proposed solution is named a novel scatterometry slot gate CDU control flow. High performance measurement and control during the slot gate step is critical as it directly controls the poly line cut profile to the active area which then directly impacts the final device performance. The proposed flow incorporates scatterometry-based CD (SCD) measurement feedback and feed forward to the Automation Process Control (APC) system, further process recipe fine tuning utilizing the data feedback and forward, and two dimensional (2D) and three dimensional (3D) scatterometry-based CD (SCD) measurement of gate after developer inspection (ADI) and after etch inspection (AEI) [1]. The methodologies and experiment results presented in this study started from the process development through the SCD model optimization of the DOE wafers, to the final implementation of the process control flow and measurement loop into the production line to evaluate its capability for long term in-line monitoring in high volume manufacturing environment. The result showed significant improvement in the gate CD uniformity that met the sub-28nm process manufacturing requirement.

  3. The Magnitude of Potential Exposure-Tool-Induced Critical Dimension and Overlay Errors in Double Dipole Lithography for the 65-nm and 45-nm Technology Nodes

    NASA Astrophysics Data System (ADS)

    Chiou, Tsann-Bim; Chen, Alek C.; Tseng, Shih-En; Eurlings, Mark; Hendrickx, Eric; Hsu, Stephen

    2004-06-01

    Double dipole lithography (DDL, DDL is a trademark of ASML Masktools.) is a viable imaging solution for the 65-nm and 45-nm technology nodes, when using ArF exposure tools. By taking advantage of the extreme off-axis illumination of the dipole, the demonstrated, small critical dimension (CD) can be resolved with a good process window. In this case k1 will be 0.31 when applying formula k1 = (minimum half pitch) × (wavelength, λ)/(numerical aperture, NA), the Rayleigh’s resolution equation with minimum half pitch of 80 nm as well as wavelength and NA of 193 nm and 0.75, respectively. The detailed CD measurement data and process window analysis can be seen. The ability of the dipole to resolve this CD, however, applies only to structures that are perpendicular to the orientation of the dipole; i.e., the x-dipole (or horizontal dipole) resolves small, vertical lines and spaces [S. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. F. Chen, J. Finders, R. J. Socha and M. Dusa: SPIE 4691 (2002), 476]. The use of the pattern decomposition [S. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. F. Chen, J. Finders, R. J. Socha and M. Dusa: SPIE 4691 (2002) 476, S. Hsu, J. F. Chen, N. Cororan, W. Knose, D. J. Van Den Broeke, T. Laidig, K. E. Wampler, X. Shi, M. Hsu, M. Eurlings, J. Finders, T. B. Chiou, R. J. Socha, W. Conley, Y. W. Hsieh, S. Tuan and F. Hsieh: SPIE 5040 (2003) 215] and double exposure of the x-dipole and the y-dipole respectively, make it possible to image an arbitrary device pattern. DDL allows integrated circuit (IC) manufacturers to maintain their roadmaps for shrinking device technology, while extending the use of ArF technology. Compared with other low-k1 imaging solutions, DDL has the advantage of using standard mask technologies, such as binary masks or 6% attenuated phase shift masks (PSMs). Because of the lower cost and faster turn-around time of these masks

  4. Electromagnetic field modeling for defect detection in 7 nm node patterned wafers

    NASA Astrophysics Data System (ADS)

    Zhu, Jinlong; Zhang, Kedi; Davoudzadeh, Nima; Wang, Xiaozhen; Goddard, Lynford L.

    2016-03-01

    By 2017, the critical dimension in patterned wafers will shrink down to 7 nm, which brings great challenges to optics-based defect inspection techniques, due to the ever-decreasing signal to noise ratio with respect to defect size. To continue pushing forward the optics-based metrology technique, it is of great importance to analyze the full characteristics of the scattering field of a wafer with a defect and then to find the most sensitive signal type. In this article, the vector boundary element method is firstly introduced to calculate the scattering field of a patterned wafer at a specific objective plane, after which a vector imaging theory is introduced to calculate the field at an image plane for an imaging system with a high numerical aperture objective lens. The above methods enable the effective modeling of the image for an arbitrary vectorial scattering electromagnetic field coming from the defect pattern of the wafer.

  5. Lithographic imaging-driven pattern edge placement errors at 10nm node

    NASA Astrophysics Data System (ADS)

    Tyminski, Jacek K.; Renwick, Stephen P.; Palmer, Shane R.; Sakamoto, Julia A.; Slonaker, Steven D.

    2016-03-01

    Demand for ever increasing level of microelectronics integration continues unabated, driving the reduction of the integrated circuit critical dimensions, and escalating requirements for image overlay and pattern dimension control. The challenges to meet these demands are compounded by requirement that pattern edge placement errors be at single nanometer levels. Layout design together with the patterning tools performance play key roles in determining location of the pattern edges at different device layers. However, complexities of the layout design often lead to stringent tradeoffs for viable optical proximity correction and imaging strategy solutions. As a result, in addition to scanner overlay performance, pattern imaging plays a key role in the pattern edge placement. The imaging contributes to edge displacement by impacting the image dimensions and by shifting the images relative to their target locations. In this report we discuss various aspects of advanced image control at 10 nm integrated circuit design rules. We analyze the impact of pattern design and scanner performance on pattern edges. We present an example of complex, three step litho-etch patterning involving immersion scanners. We draw conclusion on edge placement control when complex images interact with wafer topography.

  6. Advances with the new AIMS fab 193 2nd generation: a system for the 65 nm node including immersion

    NASA Astrophysics Data System (ADS)

    Zibold, Axel M.; Poortinga, E.; Doornmalen, H. v.; Schmid, R.; Scherubl, T.; Harnisch, W.

    2005-06-01

    The Aerial Image Measurement System, AIMS, for 193nm lithography emulation is established as a standard for the rapid prediction of wafer printability for critical structures including dense patterns and defects or repairs on masks. The main benefit of AIMS is to save expensive image qualification consisting of test wafer exposures followed by wafer CD-SEM resist or wafer analysis. By adjustment of numerical aperture (NA), illumination type and partial coherence (σ) to match any given stepper/ scanner, AIMS predicts the printability of 193nm reticles such as binary with, or without OPC and phase shifting. A new AIMS fab 193 second generation system with a maximum NA of 0.93 is now available. Improvements in field uniformity, stability over time, measurement automation and higher throughput meet the challenging requirements of the 65nm node. A new function, "Global CD Map" can be applied to automatically measure and analyse the global CD uniformity of repeating structures across a reticle. With the options of extended depth-of-focus (EDOF) software and the upcoming linear polarisation capability in the illumination the new AIMS fab 193 second generation system is able to cover both dry and immersion requirements for NA < 1. Rigorous simulations have been performed to study the effects of polarisation for imaging by comparing the aerial image of the AIMS to the resist image of the scanner.

  7. Materials and fabrication sequences for water soluble silicon integrated circuits at the 90 nm node

    SciTech Connect

    Yin, Lan; Harburg, Daniel V.; Rogers, John A.; Bozler, Carl; Omenetto, Fiorenzo

    2015-01-05

    Tungsten interconnects in silicon integrated circuits built at the 90 nm node with releasable configurations on silicon on insulator wafers serve as the basis for advanced forms of water-soluble electronics. These physically transient systems have potential uses in applications that range from temporary biomedical implants to zero-waste environmental sensors. Systematic experimental studies and modeling efforts reveal essential aspects of electrical performance in field effect transistors and complementary ring oscillators with as many as 499 stages. Accelerated tests reveal timescales for dissolution of the various constituent materials, including tungsten, silicon, and silicon dioxide. The results demonstrate that silicon complementary metal-oxide-semiconductor circuits formed with tungsten interconnects in foundry-compatible fabrication processes can serve as a path to high performance, mass-produced transient electronic systems.

  8. Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance

    NASA Astrophysics Data System (ADS)

    Tojo, Toru; Hirano, Ryoich; Tsuchiya, Hideo; Oaki, Junji; Nishizaka, Takeshi; Sanada, Yasushi; Matsuki, Kazuto; Isomura, Ikunao; Ogawa, Riki; Kobayashi, Noboru; Nakashima, Kazuhiro; Sugihara, Shinji; Inoue, Hiromu; Imai, Shinichi; Suzuki, Hitoshi; Sekine, Akihiko; Taya, Makoto; Miwa, Akemi; Yoshioka, Nobuyuki; Ohira, Katsumi; Chung, Dong-Hoon; Otaki, Masao

    2004-12-01

    A novel high-resolution mask inspection platform using DUV wavelength has been developed. This platform is designed to enable the defect inspection of high quality masks for 65nm node used in 193nm lithography. In this paper, newly developed optical system and its performance are reported. The system is operated at wavelength of 198.5nm, which wavelength is nearly equal to 193nm-ArF laser exposure tool. Some defect image data and defect inspection sensitivity due to simulation-base die-to-die (D/D) inspection are shown on standard programmed defect test mask. As an initial state D/D inspection performance, 20-60 nm defects are certified. System capabilities for 65nm node inspection and beyond are also discussed.

  9. Complete data preparation flow for Massively Parallel E-Beam lithography on 28nm node full-field design

    NASA Astrophysics Data System (ADS)

    Fay, Aurélien; Browning, Clyde; Brandt, Pieter; Chartoire, Jacky; Bérard-Bergery, Sébastien; Hazart, Jérôme; Chagoya, Alexandre; Postnikov, Sergei; Saib, Mohamed; Lattard, Ludovic; Schavione, Patrick

    2016-03-01

    Massively parallel mask-less electron beam lithography (MP-EBL) offers a large intrinsic flexibility at a low cost of ownership in comparison to conventional optical lithography tools. This attractive direct-write technique needs a dedicated data preparation flow to correct both electronic and resist processes. Moreover, Data Prep has to be completed in a short enough time to preserve the flexibility advantage of MP-EBL. While the MP-EBL tools have currently entered an advanced stage of development, this paper will focus on the data preparation side of the work for specifically the MAPPER Lithography FLX-1200 tool [1]-[4], using the ASELTA Nanographics Inscale software. The complete flow as well as the methodology used to achieve a full-field layout data preparation, within an acceptable cycle time, will be presented. Layout used for Data Prep evaluation was one of a 28 nm technology node Metal1 chip with a field size of 26x33mm2, compatible with typical stepper/scanner field sizes and wafer stepping plans. Proximity Effect Correction (PEC) was applied to the entire field, which was then exported as a single file to MAPPER Lithography's machine format, containing fractured shapes and dose assignments. The Soft Edge beam to beam stitching method was employed in the specific overlap regions defined by the machine format as well. In addition to PEC, verification of the correction was included as part of the overall data preparation cycle time. This verification step was executed on the machine file format to ensure pattern fidelity and accuracy as late in the flow as possible. Verification over the full chip, involving billions of evaluation points, is performed both at nominal conditions and at Process Window corners in order to ensure proper exposure and process latitude. The complete MP-EBL data preparation flow was demonstrated for a 28 nm node Metal1 layout in 37 hours. The final verification step shows that the Edge Placement Error (EPE) is kept below 2.25 nm

  10. Patterning process exploration of metal 1 layer in 7nm node with 3D patterning flow simulations

    NASA Astrophysics Data System (ADS)

    Gao, Weimin; Ciofi, Ivan; Saad, Yves; Matagne, Philippe; Bachmann, Michael; Oulmane, Mohamed; Gillijns, Werner; Lucas, Kevin; Demmerle, Wolfgang; Schmoeller, Thomas

    2015-03-01

    In 7mn node (N7), the logic design requires the critical poly pitch (CPP) of 42-45nm and metal 1 (M1) pitch of 28- 32nm. Such high pattern density pushes the 193 immersion lithography solution toward its limit and also brings extremely complex patterning scenarios. The N7 M1 layer may require a self-aligned quadruple patterning (SAQP) with triple litho-etch (LE3) block process. Therefore, the whole patterning process flow requires multiple exposure+etch+deposition processes and each step introduces a particular impact on the pattern profiles and the topography. In this study, we have successfully integrated a simulation tool that enables emulation of the whole patterning flow with realistic process-dependent 3D profile and topology. We use this tool to study the patterning process variations of N7 M1 layer including the overlay control, the critical dimension uniformity (CDU) budget and the lithographic process window (PW). The resulting 3D pattern structure can be used to optimize the process flow, verify design rules, extract parasitics, and most importantly, simulate the electric field and identify hot spots for dielectric reliability. As an example application, we will report extractions of maximum electric field at M1 tipto- tip which is one of the most critical patterning locations and we will demonstrate the potential of this approach for investigating the impact of process variations on dielectric reliability. We will also present simulations of an alternative M1 patterning flow, with a single exposure block using extreme ultraviolet lithography (EUVL) and analyze its advantages compared to the LE3 block approach.

  11. Hybrid Metrology and 3D-AFM Enhancement for CD Metrology Dedicated to 28 nm Node and Below Requirements

    SciTech Connect

    Foucher, J.; Faurie, P.; Dourthe, L.

    2011-11-10

    The measurement accuracy is becoming one of the major components that have to be controlled in order to guarantee sufficient production yield. Already at the R and D level, we have to come up with the accurate measurements of sub-40 nm dense trenches and contact holes coming from 193 immersion lithography or E-Beam lithography. Current production CD (Critical Dimension) metrology techniques such as CD-SEM (CD-Scanning Electron Microscope) and OCD (Optical Critical Dimension) are limited in relative accuracy for various reasons (i.e electron proximity effect, outputs parameters correlation, stack influence, electron interaction with materials...). Therefore, time for R and D is increasing, process windows degrade and finally production yield can decrease because you cannot manufactured correctly if you are unable to measure correctly. A new high volume manufacturing (HVM) CD metrology solution has to be found in order to improve the relative accuracy of production environment otherwise current CD Metrology solution will very soon get out of steam.In this paper, we will present a potential Hybrid CD metrology solution that smartly tuned 3D-AFM (3D-Atomic Force Microscope) and CD-SEM data in order to add accuracy both in R and D and production. The final goal for 'chip makers' is to improve yield and save R and D and production costs through real-time feedback loop implement on CD metrology routines. Such solution can be implemented and extended to any kind of CD metrology solution. In a 2{sup nd} part we will discuss and present results regarding a new AFM3D probes breakthrough with the introduction of full carbon tips made will E-Beam Deposition process. The goal is to overcome the current limitations of conventional flared silicon tips which are definitely not suitable for sub-32 nm nodes production.

  12. Defect window analysis by using SEM-contour based shape quantifying method for sub-20nm node production

    NASA Astrophysics Data System (ADS)

    Hibino, Daisuke; Hsu, Mingyi; Shindo, Hiroyuki; Izawa, Masayuki; Enomoto, Yuji; Lin, J. F.; Hu, J. R.

    2013-04-01

    The impact on yield loss due to systematic defect which remains after Optical Proximity Correction (OPC) modeling has increased, and achieving an acceptable yield has become more difficult in the leading technology beyond 20 nm node production. Furthermore Process-Window has become narrow because of the complexity of IC design and less process margin. In the past, the systematic defects have been inspected by human-eyes. However the judgment by human-eyes is sometime unstable and not accurate. Moreover an enormous amount of time and labor will have to be expended on the one-by-one judgment for several thousands of hot-spot defects. In order to overcome these difficulties and improve the yield and manufacturability, the automated system, which can quantify the shape difference with high accuracy and speed, is needed. Inspection points could be increased for getting higher yield, if the automated system achieves our goal. Defect Window Analysis (DWA) system by using high-precision-contour extraction from SEM image on real silicon and quantifying method which can calculate the difference between defect pattern and non-defect pattern automatically, which was developed by Hitachi High-Technologies, has been applied to the defect judgment instead of the judgment by human-eyes. The DWA result which describes process behavior might be feedback to design or OPC or mask. This new methodology and evaluation results will be presented in detail in this paper.

  13. Integration of highly-strained SiGe materials in 14 nm and beyond nodes FinFET technology

    NASA Astrophysics Data System (ADS)

    Wang, Guilei; Abedin, Ahmad; Moeen, Mahdi; Kolahdouz, Mohammadreza; Luo, Jun; Guo, Yiluan; Chen, Tao; Yin, Huaxiang; Zhu, Huilong; Li, Junfeng; Zhao, Chao; Radamson, Henry H.

    2015-01-01

    SiGe has been widely used as stressors in source/drain (S/D) regions of Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET) to enhance the channel mobility. In this study, selectively grown Si1-xGex (0.33 ⩽ x ⩽ 0.35) with boron concentration of 1 × 1020 cm-3 was used to elevate the S/D regions on bulk FinFETs in 14 nm technology node. The epitaxial quality of SiGe layers, SiGe profile and the strain amount of the SiGe layers were investigated. In order to in-situ clean the Si-fins before SiGe epitaxy, a series of prebaking experiments at temperature ranging from 740 to 825 °C were performed. The results showed that the thermal budget needs to be limited to 780-800 °C in order to avoid any damage to the shape of Si-fins but to remove the native oxide which is essential for high epitaxial quality. In this study, a kinetic gas model was also applied to predict the SiGe growth profile on Si-fins with trapezoidal shape. The input parameters for the model include growth temperature, partial pressures of reactant gases and the chip layout. By knowing the epitaxial profile, the strain to the Si-fins exerted by SiGe layers can be calculated. This is important in understanding the carrier transport in the FinFETs. The other benefit of the modeling is that it provides a cost-effective alternative for epitaxy process development as the SiGe profile can be readily predicted for any chip layout in advance.

  14. Simulation study of scaled In0.53Ga0.47As and Si FinFETs for sub-16 nm technology nodes

    NASA Astrophysics Data System (ADS)

    Seoane, N.; Aldegunde, M.; Nagy, D.; Elmessary, M. A.; Indalecio, G.; García-Loureiro, A. J.; Kalna, K.

    2016-07-01

    We investigate the performance and scalability of III-V-OI In0.53Ga0.47As and SOI Si FinFETs using state-of-the-art in-house-built 3D simulation tools. Three different technology nodes specified in the ITRS have been analysed with gate lengths (L G) of 14.0 nm, 12.8 and 10.4 nm for the InGaAs FinFETs and 12.8 nm, 10.7 and 8.1 nm for the Si devices. At a high drain bias, the 12.8 and 10.4 nm InGaAs FinFETs deliver 15% and 13% larger on-currents but 14% larger off-currents than the equivalent 12.8 and 10.7 nm Si FinFETs, respectively. For equivalent gate lengths, both the InGaAs and the Si FinFETs have the same I ON/I OFF ratio (5.9 × 104 when L G = 12.8 nm and 5.7 × 104 when L G = 10.4(10.7) nm). A more pronounced S/D tunnelling affecting the InGaAs FinFETs leads to a larger deterioration in their SS (less than 10%) and DIBL (around 20%) compared to the Si counterparts.

  15. Waveguide effect in high-NA EUV lithography: The key to extending EUV lithography to the 4-nm node

    NASA Astrophysics Data System (ADS)

    Yeung, Michael; Barouch, Eytan; Oh, Hye-Keun

    2015-06-01

    One of the main concerns about EUV lithography is whether or not it can be extended to very high numerical aperture. In this paper, rigorous electromagnetic simulation is first used to show that there is an interesting waveguide effect occurring in the 4-nm feature size regime. An exact mathematical analysis is then presented to explain the effect observed in the simulation. This waveguide effect is applied to simulate the printing of 4-nm lines and spaces with excellent aerial-image contrast and peak intensity. The feasibility of EUV lithography for printing logic circuits containing general two-dimensional patterns with 4-nm feature size is also demonstrated.

  16. Low leakage ZrO2 based capacitors for sub 20 nm dynamic random access memory technology nodes

    NASA Astrophysics Data System (ADS)

    Pešić, Milan; Knebel, Steve; Geyer, Maximilian; Schmelzer, Sebastian; Böttger, Ulrich; Kolomiiets, Nadiia; Afanas'ev, Valeri V.; Cho, Kyuho; Jung, Changhwa; Chang, Jaewan; Lim, Hanjin; Mikolajick, Thomas; Schroeder, Uwe

    2016-02-01

    During dynamic random access memory (DRAM) capacitor scaling, a lot of effort was put searching for new material stacks to overcome the scaling limitations of the current material stack, such as leakage and sufficient capacitance. In this study, very promising results for a SrTiO3 based capacitor with a record low capacitance equivalent thickness value of 0.2 nm at target leakage current are presented. Due to the material properties of SrTiO3 films (high vacancy concentration and low band gap), which are leading to an increased leakage current, a physical thickness of at least 8 nm is required at target leakage specifications. However, this physical thickness would not fit into an 18 nm DRAM structure. Therefore, two different new approaches to develop a new ZrO2 based DRAM capacitor stack by changing the inter-layer material from Al2O3 to SrO and the exchange of the top electrode material from TiN to Pt are presented. A combination of these two approaches leads to a capacitance equivalent thickness value of 0.47 nm. Most importantly, the physical thickness of <5 nm for the dielectric stack is in accordance with the target specifications. Detailed evaluation of the leakage current characteristics leads to a capacitor model which allows the prediction of the electrical behavior with thickness scaling.

  17. Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond.

    PubMed

    Mojarad, N; Hojeij, M; Wang, L; Gobrecht, J; Ekinci, Y

    2015-03-01

    All nanofabrication methods come with an intrinsic resolution limit, set by their governing physical principles and instrumentation. In the case of extreme ultraviolet (EUV) lithography at 13.5 nm wavelength, this limit is set by light diffraction and is ≈3.5 nm. In the semiconductor industry, the feasibility of reaching this limit is not only a key factor for the current developments in lithography technologies, but also is an important factor in deciding whether photon-based lithography will be used for future high-volume manufacturing. Using EUV-interference lithography we show patterning with 7 nm resolution in making dense periodic line-space structures with 14 nm periodicity. Achieving such a cutting-edge resolution has been possible by integrating a high-quality synchrotron beam, precise nanofabrication of masks, very stable exposures instrumentation, and utilizing effective photoresists. We have carried out exposure on silicon- and hafnium-based photoresists and we demonstrated the extraordinary capability of the latter resist to be used as a hard mask for pattern transfer into Si. Our results confirm the capability of EUV lithography in the reproducible fabrication of dense patterns with single-digit resolution. Moreover, it shows the capability of interference lithography, using transmission gratings, in evaluating the resolution limits of photoresists. PMID:25653148

  18. Black border, mask 3D effects: covering challenges of EUV mask architecture for 22nm node and beyond

    NASA Astrophysics Data System (ADS)

    Davydova, Natalia; van Setten, Eelco; de Kruif, Robert; Connolly, Brid; Fukugami, Norihito; Kodera, Yutaka; Morimoto, Hiroaki; Sakata, Yo; Kotani, Jun; Kondo, Shinpei; Imoto, Tomohiro; Rolff, Haiko; Ullrich, Albrecht; Jaganatharaja, Ramasubramanian Kottumakulal; Lammers, Ad; Oorschot, Dorothe; Man, Cheuk-Wah; Schiffelers, Guido; van Dijk, Joep

    2014-10-01

    Photomask is at the heart of a lithographic scanner's optical path. It cannot be left non-optimized from the imaging point of view. In this work we provide new insights on two critical aspects of EUV mask architecture: optimization of absorber for 16 nm half-pitch imaging and a systematic approach to black border EUV and DUV reflectance specifications. Good 16 nm imaging is demonstrated on ASML NXE:3300 EUV scanner. Currently a relatively high dose resist is used for imaging and the dose reduction is desired. Optimization (reduction) of absorber height and mask CD bias can allow for up to 30% dose reduction without essential contrast loss. Disadvantages of absorber height reduction are ~7 nm increase of best focus range through pitch and tighter absorber height mean to target and uniformity requirements. A disadvantage of a smaller reticle CD (down to 14 nm 1x) is manufacturing process uniformity over the reticle. A systematic approach of black border reflections impact on imaging is established. The image border is a pattern free dark area surrounding the image field and preventing exposure of the image field neighborhood on wafer. Currently accepted design of the black border on EUV reticle is an image border where the absorber and multilayer stack are etched down to the substrate and EUV reflectance is reduced to <0.05%. DUV reflectance of such a black border is about 5%. It is shown that a tighter DUV reflectance specification <1.5% is required driven by the impact of DUV reflections from the black border on imaging. NXE:3300 and NXE:3100 experimental imaging results are shown. The need of low DUV wavelength reflectance metrology (in the range 100-300 nm) is demonstrated using an estimated NXE scanner out-of-band DUV spectrum. Promising results of low DUV reflectance of the black border are shown.

  19. Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond

    NASA Astrophysics Data System (ADS)

    Mojarad, N.; Hojeij, M.; Wang, L.; Gobrecht, J.; Ekinci, Y.

    2015-02-01

    All nanofabrication methods come with an intrinsic resolution limit, set by their governing physical principles and instrumentation. In the case of extreme ultraviolet (EUV) lithography at 13.5 nm wavelength, this limit is set by light diffraction and is ~3.5 nm. In the semiconductor industry, the feasibility of reaching this limit is not only a key factor for the current developments in lithography technologies, but also is an important factor in deciding whether photon-based lithography will be used for future high-volume manufacturing. Using EUV-interference lithography we show patterning with 7 nm resolution in making dense periodic line-space structures with 14 nm periodicity. Achieving such a cutting-edge resolution has been possible by integrating a high-quality synchrotron beam, precise nanofabrication of masks, very stable exposures instrumentation, and utilizing effective photoresists. We have carried out exposure on silicon- and hafnium-based photoresists and we demonstrated the extraordinary capability of the latter resist to be used as a hard mask for pattern transfer into Si. Our results confirm the capability of EUV lithography in the reproducible fabrication of dense patterns with single-digit resolution. Moreover, it shows the capability of interference lithography, using transmission gratings, in evaluating the resolution limits of photoresists.All nanofabrication methods come with an intrinsic resolution limit, set by their governing physical principles and instrumentation. In the case of extreme ultraviolet (EUV) lithography at 13.5 nm wavelength, this limit is set by light diffraction and is ~3.5 nm. In the semiconductor industry, the feasibility of reaching this limit is not only a key factor for the current developments in lithography technologies, but also is an important factor in deciding whether photon-based lithography will be used for future high-volume manufacturing. Using EUV-interference lithography we show patterning with 7 nm

  20. Specifications and methodologies for benchmarking of advanced CD-SEMs at the 90-nm CMOS technology node and beyond

    NASA Astrophysics Data System (ADS)

    Bunday, Benjamin D.; Bishop, Michael

    2003-05-01

    In this work, an extremely flexible and simple dissolution rate monitor (DRM) based on inexpensive, commercially available, PC card spectrometers has been built that can be used quite robustly in both fab and laboratory environments for measuring the dissolution behavior of photoreist films. The hardware required in order to construct such a simple apparatus has been discussed along with various experimental configurations that are appropriate for different measurement tasks. A multiwavelength interferometric data analysis software (MIDAS) has been developed in this work that can robustly perform both single wavelength and multiwavelength DRM data analysis. The multiwavelength DRM and MIDAS software have been found to be very useful in analyzing a variety of resist film dissolution phenomena including monitoring films possessing dissolution rates exceeding 100 nm/s and studying resist film surface inhibition/acceleration. Another useful application has been to measure swelling in the processing of photoresists and other polymer thin films. The basic approaches and algorithms used for thin film thickness and dissolution rate determination in the MIDAS software are discussed in this paper. Results from the use of the MIDAS software in various applications are presented.

  1. Impact of the spacer dielectric constant on parasitic RC and design guidelines to optimize DC/AC performance in 10-nm-node Si-nanowire FETs

    NASA Astrophysics Data System (ADS)

    Hong, Jae-Ho; Lee, Sang-Hyun; Kim, Ye-Ram; Jeong, Eui-Young; Yoon, Jun-Sik; Lee, Jeong-Soo; Baek, Rock-Hyun; Jeong, Yoon-Ha

    2015-04-01

    In this paper, we propose an optimized design for Si-nanowire FETs in terms of spacer dielectric constant (κsp), extension length (LEXT), nanowire diameter (Dnw), and operation voltage (VDD) for the sub-10 nm technology node. Using well-calibrated TCAD simulations and analytic RC models, we have quantitatively evaluated geometry-dependent parasitic series resistances (RSD) and capacitances (Cpara). Compared with low-κ spacers, high-κ spacers exhibit a higher on/off-current ratio with a lower RSD, but show severe degradation in their AC performance owing to a higher Cpara. Considering the trade-off between RSD and Cpara, optimal geometry-dependent κsp values at various supply voltages (VDD) are determined using gate delay (CV/I) and current-gain cutoff frequency (fT). We found that as LEXT and VDD decrease and Dnw increases, the optimal κsp value shifts from the high-κ to low-κ regime.

  2. Low leakage Ru-strontium titanate-Ru metal-insulator-metal capacitors for sub-20 nm technology node in dynamic random access memory

    SciTech Connect

    Popovici, M. Swerts, J.; Redolfi, A.; Kaczer, B.; Aoulaiche, M.; Radu, I.; Clima, S.; Everaert, J.-L.; Van Elshocht, S.; Jurczak, M.

    2014-02-24

    Improved metal-insulator-metal capacitor (MIMCAP) stacks with strontium titanate (STO) as dielectric sandwiched between Ru as top and bottom electrode are shown. The Ru/STO/Ru stack demonstrates clearly its potential to reach sub-20 nm technology nodes for dynamic random access memory. Downscaling of the equivalent oxide thickness, leakage current density (J{sub g}) of the MIMCAPs, and physical thickness of the STO have been realized by control of the Sr/Ti ratio and grain size using a heterogeneous TiO{sub 2}/STO based nanolaminate stack deposition and a two-step crystallization anneal. Replacement of TiN with Ru as both top and bottom electrodes reduces the amount of electrically active defects and is essential to achieve a low leakage current in the MIM capacitor.

  3. Advanced mask technique to improve bit line CD uniformity of 90 nm node flash memory in low-k1 lithography

    NASA Astrophysics Data System (ADS)

    Kim, Jong-doo; Choi, Jae-young; Kim, Jea-hee; Han, Jae-won

    2008-10-01

    As devices size move toward 90nm technology node or below, defining uniform bit line CD of flash devices is one of the most challenging features to print in KrF lithography. There are two principal difficulties in defining bit line on wafer. One is insufficient process margin besides poor resolution compared with ArF lithography. The other is that asymmetric bit line should be made for OPC(Optical Proximity Correction) modeling. Therefore advanced ArF lithography scanner should be used for define bit line with RETs (Resolution Enhancement Techniques) such as immersion lithography, OPC, PSM(Phase Shift Mask), high NA(Numerical Aperture), OAI(Off-Axis Illumination), SRAF(Sub-resolution Assistant Feature), and mask biasing.. Like this, ArF lithography propose the method of enhancing resolution, however, we must spend an enormous amount of CoC(cost of ownership) to utilize ArF photolithography process than KrF. In this paper, we suggest method to improve of bit line CD uniformity, patterned by KrF lithographic process in 90nm sFlash(stand alone Flash) devices. We applied new scheme of mask manufacturing, which is able to realize 2 different types of mask, binary and phase-shift, into one plate. Finally, we could get the more uniform bit lines and we expect to get more stable properties then before applying this technique.

  4. PINS-3X Operations

    SciTech Connect

    E.H. Seabury

    2013-09-01

    Idaho National Laboratory’s (INL’s) Portable Isotopic Neutron Spectroscopy System (PINS) non-intrusively identifies the chemical fill of munitions and sealed containers. The PINS-3X variant of the system is used to identify explosives and uses a deuterium-tritium (DT) electronic neutron generator (ENG) as the neutron source. Use of the system, including possession and use of the neutron generator and shipment of the system components requires compliance with a number of regulations. This report outlines some of these requirements as well as some of the requirements in using the system outside of INL.

  5. Integration and automation of DoseMapper in a logic fab APC system: application for 45/40/28nm node

    NASA Astrophysics Data System (ADS)

    Le Gratiet, Bertrand; Salagnon, Christophe; de Caunes, Jean; Mikolajczak, Marc; Morin, Vincent; Chojnowski, Nicolas; Sundermann, Frank; Massin, Jean; Pelletier, Alice; Metz, Joel; Blancquaert, Yoann; Bouyssou, Regis; Pelissier, Arthur; Belmont, Olivier; Strapazzon, Anne; Phillips, Anna; Devoivre, Thierry; Bernard, Emilie; Batail, Estelle; Thevenon, Lionel; Bry, Benedicte; Bernard-Granger, Fabrice; Oumina, Ahmed; Baron, Marie-Pierre; Gueze, Didier

    2012-03-01

    The main difficulty related to DoseMapper correction is to generate an appropriate CD datacollection to feed DoseMapper and to generate DoseRecipe in a user friendly way, especially with a complex process mix. We could heavily measure the silicon and create, in feedback mode, the corresponding DoseRecipe. However, such approach in a logic fab becomes a heavy duty due to the number of different masks / product / processes. We have observed that process CD variability is significantly depending on systematic intrawafer and intrafield CD footprints that can be measured and applied has generic pre-correction for any new product/mask process in-line. The applied CD correction is based on a CD (intrafield: Mask + Straylight & intrawafer: Etch Bias) variability "model" handled by the FAB APC (Advanced Process Control). - Individual CD profile correction component are generated "off-line" (1) for Intrafield Mask via automatic CD extraction from a Reticle CD database (2) for Intrafield Straylight via a CD "model" (3) for Intrawafer Etch Bias via engineering input based on process monitoring. - These CD files are handled via the FAB APC/automation system which is remotely taking control of DoseMapper server via WEB services, so that CD profiles are generated "off-line" (before the lot is being processed) and stored in a profile database while DoseRecipes are created "real-time" on demand via the automation when the lot comes to the scanner to be processed. DoseRecipe and CD correction profiles management is done via the APC system. The automated DoseRecipe creation is now running since the beginning of 2011 contributing to bring both intrafield and intrawafer GATE CDu below 1nm 3sigma, for 45/40 & 28nm nodes.

  6. Evaluation and implementation of TeraScan reflected light die-to-database inspection mode for 65nm design node process

    NASA Astrophysics Data System (ADS)

    Hsu, Luke T. H.; Ho, C. H.; Lin, C. C.; Hsu, Vincent; Chen, Ellison; Yu, Paul; Son, Kong

    2005-11-01

    The standard inspection flow typically consists of transmitted light pattern inspection (die-to-die or die-to-database) and STARlightTM (Simultaneous Transmitted And Reflective Light) contamination inspection. The initial introduction of TeraScan (DUV) inspection system was limited to transmitted pattern inspection modes. Hence, complete inspections of critical mask layers required utilizing TeraScan for maximized pattern defect sensitivity and the previous generation TeraStar (UV) for STARlightTM contamination inspection. Recently, the reflective light die-to-database (dbR) inspection mode was introduced on the DUV tool to compliment transmitted light die-to-database (dbT) inspection. The dbR inspection mode provides not only pattern inspection but also contamination inspection capabilities. The intent of this evaluation is to characterize the dbR inspection capability on pattern defects and contaminations. A series of standard programmed defect test plates will be used to evaluate pattern inspection capability and a PSL test plate will be used to determine the contamination performance. Inspection results will be compared to the current inspection process of record (dbT + STARlightTM). Lastly, the learning will be used to develop and implement an optimal dbR inspection flow for selected critical layers of the 65-nm node to meet the inspection criteria and minimize the cycle time.

  7. Optimization of SiGe selective epitaxy for source/drain engineering in 22 nm node complementary metal-oxide semiconductor (CMOS)

    NASA Astrophysics Data System (ADS)

    Wang, G. L.; Moeen, M.; Abedin, A.; Kolahdouz, M.; Luo, J.; Qin, C. L.; Zhu, H. L.; Yan, J.; Yin, H. Z.; Li, J. F.; Zhao, C.; Radamson, H. H.

    2013-09-01

    SiGe has been widely used for source/drain (S/D) engineering in pMOSFETs to enhance channel mobility. In this study, selective Si1-xGex growth (0.25 ≤ x ≤ 0.35) with boron concentration of 1-3 × 1020 cm-3 in the process for 22 nm node complementary metal-oxide semiconductor (CMOS) has been investigated and optimized. The growth parameters were carefully tuned to achieve deposition of high quality and highly strained material. The thermal budget was decreased to 800 °C to suppress dopant diffusion, to minimize Si loss in S/D recesses, and to preserve the S/D recess shape. Two layers of Si1-xGex were deposited: a bottom layer with high Ge content (x = 0.35) which filled the recess and a cap layer with low Ge content (x = 0.25) which was elevated in the S/D regions. The elevated SiGe cap layer was intended to be consumed during the Ni-silicidation process in order to avoid strain reduction in the channel region arising from strain relaxation in SiGe S/D. In this study, a kinetic gas model was also applied to predict the pattern dependency of the growth and to determine the epi-profile in different transistor arrays. The input parameters include growth temperature, partial pressures of reactant gases, and chip layout. By using this model, the number of test wafers for epitaxy experiments can be decreased significantly. When the epitaxy process parameters can be readily predicted by the model for epi-profile control in an advanced chip design, fast and cost-effective process development can be achieved.

  8. Impact of pattern dependency of SiGe layers grown selectively in source/drain on the performance of 14 nm node FinFETs

    NASA Astrophysics Data System (ADS)

    Qin, Changliang; Wang, Guilei; Kolahdouz, M.; Luo, Jun; Yin, Huaxing; Yang, Ping; Li, Junfeng; Zhu, Huilong; Chao, Zhao; Ye, Tianchun; Radamson, Henry H.

    2016-10-01

    A complete mapping of 14 nm FinFETs performance over 200 mm wafers was performed and the pattern dependency of SiGe selective growth was calculated using an empirical kinetic molecule model for the reactant precursors. The transistor structures were analyzed by conventional characterization tools and their performance was simulated by considering the process related variations. The applied model presents for the first time a powerful tool for transistor community to predict the SiGe profile and strain modulating over a processed wafer, independent of wafer size.

  9. Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for 10nm technology nodes and beyond

    NASA Astrophysics Data System (ADS)

    Wang, Lynn T.; Schroeder, Uwe Paul; Woo, Youngtag; Zeng, Jia; Madhavan, Sriram; Capodieci, Luigi

    2016-03-01

    A pattern-based methodology for optimizing Self-Aligned Double Patterning (SADP)-compliant layout designs is developed based on detecting cut-induced hotspot patterns and replacing them with pre-characterized fixing solutions. A pattern library with predetermined fixing solutions is built. A pattern-based engine searches for matching patterns in the layout designs. When a match is found, the engine opportunistically replaces the detected pattern with a pre-characterized fixing solution, preserving only the design rule check-clean replacements. The methodology is demonstrated on a 10nm routed block. A small library of fourteen patterns reduced the number of cut-induced design rule check violations by 100% and lithography hotspots by 23%.

  10. Single and compact ESD device Beta-Matrix solution based on bidirectional SCR Network in advanced 28/32 nm technology node

    NASA Astrophysics Data System (ADS)

    Bourgeat, Johan; Galy, Philippe

    2013-09-01

    Advanced CMOS technologies, like CMOS32 nm high K metal gate, become more and more sensitive to electrostatic discharge (ESD) phenomenon particularly because of their low overvoltage robustness. In this context, we develop a Beta-Matrix concept [1] which merges six silicon controlled rectifier (SCR) in a same structure and having one single triggering gate N (GN) for a high integration and high flexibility in IO frame. This device is the center of a new protection strategy which combined both local and global protection approach [1]. Also, a specific trigger circuit has been developed to turn-on Beta-Matrix whatever stressed pins during an ESD event and to keep it off when IC is in normal operation mode and is presented in [2]. Both, Beta-Matrix and trigger circuit, make a robust and very efficient ESD network which allows removing all IO placement constraint and power IO [3]. Also, this study is a synthesis of both previous work and a development of new Beta-Matrix topology to improve the device behavior, particularly by improving the uniformity of activation and decreasing triggering voltage of the structure. This work presents results of 3 dimensional TCAD simulations and measurements of transmission line pulse (TLP) and very fast-TLP.

  11. Lymph nodes

    MedlinePlus Videos and Cool Tools

    ... and conveying lymph and by producing various blood cells. Lymph nodes play an important part in the ... the microorganisms being trapped inside collections of lymph cells or nodes. Eventually, these organisms are destroyed and ...

  12. Connecting Node

    NASA Technical Reports Server (NTRS)

    Johnson, Christopher J.; Raboin, Jasen L.; Spexarth, Gary R.

    2009-01-01

    A paper describes the Octanode, a connecting node that facilitates the integration of multiple docking mechanisms, hatches, windows, and internal and external systems with the use of flat surfaces. The Octanode is a 26- faced Great Rhombicuboctahedron Archi medean solid with six octagonshaped panels, eight hexagon-shaped panels, and 12 square panels using three unique, simple, flat shapes to construct a spherical approximation. Each flat shape can be constructed with a variety of material and manufacturing techniques, such as honeycomb composite panels or a pocketed skinstringer configuration, using conventional means. The flat shapes can be connected together and sealed to create a pressurizable volume by the use of any conventional means including welding or fastening devices and sealant. The node can then be connected to other elements to allow transfer between those elements, or it could serve as an airlock. The Octanode can be manufactured on the ground and can be integrated with subsystems including hatches and ports. The node can then be transported to its intended location, whether on orbit or on surface. Any of the flat panels could be replaced by curved ones, turning the node into a copula. Windows may be placed on flat panes with optimal viewing angles that are not blocked by large connecting nodes. The advantage of using flat panels to represent a spherical approximation is that this allows for easier integration of subsystems and design features.

  13. A 3 x 2 Achievement Goal Model

    ERIC Educational Resources Information Center

    Elliot, Andrew J.; Murayama, Kou; Pekrun, Reinhard

    2011-01-01

    In the present research, a 3 x 2 model of achievement goals is proposed and tested. The model is rooted in the definition and valence components of competence, and encompasses 6 goal constructs: task-approach, task-avoidance, self-approach, self-avoidance, other-approach, and other-avoidance. The results from 2 studies provided strong support for…

  14. The SEMATECH Berkeley MET pushing EUV development beyond 22-nm half pitch

    SciTech Connect

    Naulleau, P.; Anderson, C. N.; Backlea-an, L.-M.; Chan, D.; Denham, P.; George, S.; Goldberg, K. A.; Hoef, B.; Jones, G.; Koh, C.; La Fontaine, B.; McClinton, B.; Miyakawa, R.; Montgomery, W.; Rekawa, S.; Wallow, T.

    2010-03-18

    Microfield exposure tools (METs) play a crucial role in the development of extreme ultraviolet (EUV) resists and masks, One of these tools is the SEMATECH Berkeley 0.3 numerical aperture (NA) MET, Using conventional illumination this tool is limited to approximately 22-nm half pitch resolution. However, resolution enhancement techniques have been used to push the patterning capabilities of this tool to half pitches of 18 nm and below, This resolution was achieved in a new imageable hard mask which also supports contact printing down to 22 nm with conventional illumination. Along with resolution, line-edge roughness is another crucial hurdle facing EUV resists, Much of the resist LER, however, can be attributed to the mask. We have shown that intenssionally aggressive mask cleaning on an older generation mask causes correlated LER in photoresist to increase from 3.4 nm to 4,0 nm, We have also shown that new generation EUV masks (100 pm of substrate roughness) can achieve correlated LER values of 1.1 nm, a 3x improvement over the correlated LER of older generation EUV masks (230 pm of substrate roughness), Finally, a 0.5-NA MET has been proposed that will address the needs of EUV development at the 16-nm node and beyond, The tool will support an ultimate resolution of 8 nm half-pitch and generalized printing using conventional illumination down to 12 nm half pitch.

  15. Intermonitor variability of GT3X accelerometer.

    PubMed

    Santos-Lozano, A; Torres-Luque, G; Marín, P J; Ruiz, J R; Lucia, A; Garatachea, N

    2012-12-01

    The main purpose of this study was to assess the inter-monitor reliability of the tri-axial GT3X Actigraph accelerometer over a range of physical activities (PA). This device collects motion data on each of the vertical (Y), horizontal right-left (X), and horizontal front-back (Z) axes and also calculates the vector summed value √X(2)+Y(2)+Z(2) known as 'vector magnitude' (VM). 8 GT3X accelerometers were worn at the same time by the same participant. Accelerometers were placed back-to-front, all facing forward and in sets of 4 securely taped together, attached to a belt and allocating each block above either left or right hip at waist level. Inter-monitor reliability was assessed during 6 conditions: rest, walking (4 and 6 km·h(-1)), running (8 and 10 km·h(-1)) and repeated sit-to-stand (40 times·min(-1)). The intra-class correlation coefficients were high for X, Y and Z axes (i.e., all ≥ 0.925) and for VM (≥ 0.946). In conclusion, we found good inter-instrument reliability of the GT3X accelerometer across all planes, yet our results also suggest that the X and Z axes do not provide further benefits over the 'traditional' Y-axis to assess the movement in typical PA.

  16. Reconfigureable network node

    DOEpatents

    Vanderveen, Keith B.; Talbot, Edward B.; Mayer, Laurence E.

    2008-04-08

    Nodes in a network having a plurality of nodes establish communication links with other nodes using available transmission media, as the ability to establish such links becomes available and desirable. The nodes predict when existing communications links will fail, become overloaded or otherwise degrade network effectiveness and act to establish substitute or additional links before the node's ability to communicate with the other nodes on the network is adversely affected. A node stores network topology information and programmed link establishment rules and criteria. The node evaluates characteristics that predict existing links with other nodes becoming unavailable or degraded. The node then determines whether it can form a communication link with a substitute node, in order to maintain connectivity with the network. When changing its communication links, a node broadcasts that information to the network. Other nodes update their stored topology information and consider the updated topology when establishing new communications links for themselves.

  17. Lymph node biopsy

    MedlinePlus

    Biopsy - lymph nodes; Open lymph node biopsy; Fine needle aspiration biopsy; Sentinel lymph node biopsy ... then sent to the laboratory for examination. A needle biopsy involves inserting a needle into a lymph ...

  18. Extending immersion lithography down to 1x nm production nodes

    NASA Astrophysics Data System (ADS)

    de Boeij, Wim P.; Pieternella, Remi; Bouchoms, Igor; Leenders, Martijn; Hoofman, Marjan; de Graaf, Roelof; Kok, Haico; Broman, Par; Smits, Joost; Kuit, Jan-Jaap; McLaren, Matthew

    2013-04-01

    In this paper we report on the performance enhancements on the NXT immersion scanner platform to support the immersion lithography roadmap. We particular discuss scanner modules that enable future overlay and focus requirements. Among others we describe the improvements in grid calibrations and grid matching; thermal control of reticle heating with dynamic systems adjustments; aberration tuning and FlexWave-lens heating control as well as aberration- and overlay-metrology on wafer-2-wafer timescales. Finally we address reduction of leveling process dependencies, stage servo dynamics and wafer table flatness to enhance on-product focus and leveling performance. We present and discuss module- and system-data of the above mentioned scanner improvements.

  19. Lymph node hyalinization in elderly Japanese.

    PubMed

    Taniguchi, I; Murakami, G; Sato, A; Fujiwara, D; Ichikawa, H; Yajima, T; Kohama, G

    2003-10-01

    Lymph node hyalinization has been comprehensively investigated using specimens obtained from elderly Japanese and white Americans. Onion-peel lesions and associated meshwork areas were often found in the medullary sinus of the thoracic node (mediastinal-type hyalinization), while eosinophilic, glassy and spotty lesions were consistently seen in B lymphocyte areas of the pelvic node (pelvic-type hyalinization). The mediastinal-type hyalinization was comprised of thin collagen fibrils (ca 50 nm in diameter), whereas the pelvic-type hyalinization had thick fibrils (ca 150 nm in diameter). This difference seemed to be consistent with a difference in composite collagen fibrils of vascular walls between the thoracic and pelvic regions. The pelvic-type hyalinization was often or sometimes seen in other nodes, such as cervical, axillary, abdominal and inguinal nodes, especially in white Americans. The mediastinal-type hyalinization, usually in combination with a sinus filled with anthracotic macrophages, tended to be observed in Japanese more frequently than in white Americans. Anthracosis seemed to be connected to the pathogenesis of the hyalinization. On the other hand, because the lesion was weakly positive for Factor VIII immunohistochemistry and because lesions were located along thin vessels, the pelvic-type hyalinization seemed to originate from vascular degeneration in the nodal cortex. Due to the high incidence and large proportion in total volume of the node, the hyalinization seems to be one of the major events that diminish the nodal filtration function and ruin the node with aging. PMID:12973685

  20. Multiple node remote messaging

    DOEpatents

    Blumrich, Matthias A.; Chen, Dong; Gara, Alan G.; Giampapa, Mark E.; Heidelberger, Philip; Ohmacht, Martin; Salapura, Valentina; Steinmacher-Burow, Burkhard; Vranas, Pavlos

    2010-08-31

    A method for passing remote messages in a parallel computer system formed as a network of interconnected compute nodes includes that a first compute node (A) sends a single remote message to a remote second compute node (B) in order to control the remote second compute node (B) to send at least one remote message. The method includes various steps including controlling a DMA engine at first compute node (A) to prepare the single remote message to include a first message descriptor and at least one remote message descriptor for controlling the remote second compute node (B) to send at least one remote message, including putting the first message descriptor into an injection FIFO at the first compute node (A) and sending the single remote message and the at least one remote message descriptor to the second compute node (B).

  1. Modular sensor network node

    DOEpatents

    Davis, Jesse Harper Zehring; Stark, Jr., Douglas Paul; Kershaw, Christopher Patrick; Kyker, Ronald Dean

    2008-06-10

    A distributed wireless sensor network node is disclosed. The wireless sensor network node includes a plurality of sensor modules coupled to a system bus and configured to sense a parameter. The parameter may be an object, an event or any other parameter. The node collects data representative of the parameter. The node also includes a communication module coupled to the system bus and configured to allow the node to communicate with other nodes. The node also includes a processing module coupled to the system bus and adapted to receive the data from the sensor module and operable to analyze the data. The node also includes a power module connected to the system bus and operable to generate a regulated voltage.

  2. Sentinel node biopsy (image)

    MedlinePlus

    ... cancer, allows a more accurate staging of the cancer, and leaves unaffected nodes behind to continue the important job of draining fluids. The procedure involves the injection of a dye (sometimes mildly radioactive) to pinpoint the lymph node ...

  3. Dynamic Interaction of Stress Granules, DDX3X, and IKK-α Mediates Multiple Functions in Hepatitis C Virus Infection

    PubMed Central

    Pène, Véronique; Sodroski, Catherine; Hsu, Ching-Sheng

    2015-01-01

    ABSTRACT The ubiquitous ATP-dependent RNA helicase DDX3X is involved in many cellular functions, including innate immunity, and is a pivotal host factor for hepatitis C virus (HCV) infection. Recently, we showed that DDX3X specifically recognizes the HCV 3′ untranslated region (UTR), leading to the activation of IKK-α and a cascade of lipogenic signaling to facilitate lipid droplet biogenesis and viral assembly (Q. Li, V. Pene, S. Krishnamurthy, H. Cha, and T. J. Liang, Nat Med 19:722–729, 2013, http://dx.doi.org/10.1038/nm.3190). The interaction of DDX3X with HCV core protein seems to be dispensable for its proviral role. In this study, through systematic imaging and biochemical and virologic approaches, we identified a dynamic association between DDX3X and various cellular compartments and viral elements mediating multiple functions of DDX3X in productive HCV infection. Upon HCV infection, the HCV 3′UTR interacts with DDX3X and IKK-α, which redistribute to speckle-like cytoplasmic structures shown to be stress granules (SGs). As viral proteins accumulate in infected cells, DDX3X granules together with SG-associated proteins redistribute and colocalize with HCV core protein around lipid droplets (LDs). IKK-α, however, does not relocate to the LD but translocates to the nucleus. In HCV-infected cells, various HCV nonstructural proteins also interact or colocalize with DDX3X in close proximity to SGs and LDs, consistent with the tight juxtaposition of the replication complex and the assembly site at the surface of LDs. Short interfering RNA (siRNA)-mediated silencing of DDX3X and multiple SG components markedly inhibits HCV infection. Our data suggest that DDX3X initiates a multifaceted cellular program involving dynamic associations with HCV RNA and proteins, IKK-α, SG, and LD surfaces for its crucial role in the HCV life cycle. IMPORTANCE DDX3X is a proviral host factor for HCV infection. Recently, we showed that DDX3X binds to the HCV 3

  4. Intramammary lymph nodes.

    PubMed

    Egan, R L; McSweeney, M B

    1983-05-15

    Radiographic, gross, and histopathologic studies on 158 whole breasts with primary operable carcinoma revealed intramammary lymph nodes in 28%, and of these breasts, 10% contained a metastatic deposit of carcinoma. Cancerous and noncancerous nodes were found in all quadrants of the breast with the positive ones being in the same quadrant as the carcinoma only 50% of the time. There was no demonstrable connection with the usual lymphatic drainage of the breast. With Stage II carcinoma, positive intramammary lymph nodes had no direct effect on prognosis, merely representing advanced disease and indicating a greater likelihood of axillary metastatic disease. There was a trend toward poorer prognosis in Stage I lesions with positive intramammary lymph nodes. This may indicate the Stage I carcinomas that have a similar prognosis as Stage II tumors. Conceivably, a Stage Ia, positive intramammary lymph node(s) but normal axillary lymph nodes, could be defined and used.

  5. Sol-Gel Synthesis of La(0.6)Sr(0.4)CoO(3-x) and Sm(0.5)Sr(0.5)CoO(3-x) Cathode Nanopowders for Solid Oxide Fuel Cells

    NASA Technical Reports Server (NTRS)

    Bansal, Narottam P.; Wise, Brent

    2011-01-01

    Nanopowders of La(0.6)Sr(0.4)CoO(3-x) (LSC) and Sm(0.5)Sr(0.5)CoO(3-x) (SSC) compositions, which are being investigated as cathode materials for intermediate temperature solid oxide fuel cells (IT-SOFC) with La(Sr)Ga(Mg)O(3-x) (LSGM) as the electrolyte, were synthesized by low-temperature sol-gel method using metal nitrates and citric acid. Thermal decomposition of the citrate gels was followed by simultaneous DSC/TGA methods. Development of phases in the gels, on heat treatments at various temperatures, was monitored by x-ray diffraction. Solgel powders calcined at 550 to 1000 C consisted of a number of phases. Single perovskite phase La(0.6)Sr(0.4)CoO(3-x) or Sm(0.5)Sr(0.5)CoO(3-x) powders were obtained at 1200 and 1300 C, respectively. Morphological analysis of the powders calcined at various temperatures was done by scanning electron microscopy. The average particle size of the powders was approx.15 nm after 700 C calcinations and slowly increased to 70 to 100 nm after heat treatments at 1300 to 1400 C.

  6. Maximizing the photo catalytic and photo response properties of multimodal plasmonic Ag/WO(3-x) heterostructure nanorods by variation of the Ag size.

    PubMed

    Ghosh, Sirshendu; Saha, Manas; Paul, Sumana; De, S K

    2015-11-21

    High quality nearly monodisperse colloidal WO3-x nanorods with an aspect ratio ∼18 were synthesized using the thermal decomposition technique. The effects of a capping agent and an activating agent on the nanorod aspect ratio have been studied. Excess carrier concentration due to large oxygen vacancy and smaller width of the nanorods compared to the Bohr exciton radius gives rise to an increase of the band gap. Shape anisotropy in nanorods results in two plasmonic absorbance bands at about 890 nm and 5900 nm corresponding to short axis and long axis plasmon modes. The short axis mode reveals an excellent plasmonic sensitivity of ∼345 nm per refractive index. A plasmonic photocatalysis process based on WO3-x nanorods has been developed to synthesize Ag/WO3-x heterostructures consisting of multiple Ag dots with ∼2 nm size, randomly decorated on the surface of the WO3-x nanorods. Long time irradiation leads to an increase in the size (5 nm) of Ag nanocrystals concomitant with decrease in the number of Ag nanocrystals attached per WO3-x nanorod. Plasmonic photocatalysis followed by thermal annealing produces only one Ag nanocrystal of size ∼10 nm on each WO3-x nanorod. Red shifting and broadening of plasmon bands of Ag nanocrystals and WO3-x nanorods confirm the formation of heterostructures between the metal and semiconductor. Detailed transmission electron micrograph analysis indicates the epitaxial growth of Ag nanocrystals onto WO3-x nanorods. A high photocurrent gain of about 4000 is observed for Ag (10 nm)/WO3-x heterostructures. The photodegradation rate for Rhodamine-B and methylene blue is maximum for Ag (10 nm)/WO3-x heterostructures due to efficient electron transfer from WO3-x nanorods to Ag nanocrystals. Metal plasmon-semiconductor exciton coupling, prominent plasmon absorbance of metal nanoparticles, and formation of an epitaxial interface are found to be the important factors to achieve the maximum photocatalytic activity and fabrication of a

  7. Protocol for multiple node network

    NASA Technical Reports Server (NTRS)

    Kirkham, Harold (Inventor)

    1995-01-01

    The invention is a multiple interconnected network of intelligent message-repeating remote nodes which employs an antibody recognition message termination process performed by all remote nodes and a remote node polling process performed by other nodes which are master units controlling remote nodes in respective zones of the network assigned to respective master nodes. Each remote node repeats only those messages originated in the local zone, to provide isolation among the master nodes.

  8. Protocol for multiple node network

    NASA Technical Reports Server (NTRS)

    Kirkham, Harold (Inventor)

    1994-01-01

    The invention is a multiple interconnected network of intelligent message-repeating remote nodes which employs an antibody recognition message termination process performed by all remote nodes and a remote node polling process performed by other nodes which are master units controlling remote nodes in respective zones of the network assigned to respective master nodes. Each remote node repeats only those messages originated in the local zone, to provide isolation among the master nodes.

  9. 32nm overlay improvement capabilities

    NASA Astrophysics Data System (ADS)

    Eichelberger, Brad; Huang, Kevin; O'Brien, Kelly; Tien, David; Tsai, Frank; Minvielle, Anna; Singh, Lovejeet; Schefske, Jeffrey

    2008-03-01

    The industry is facing a major challenge looking forward on the technology roadmap with respect to overlay control. Immersion lithography has established itself as the POR for 45nm and for the next few nodes. As the gap closes between scanner capability and device requirements new methodologies need to be taken into consideration. Double patterning lithography is an approach that's being considered for 32 and below, but it creates very strict demands for overlay performance. The fact that a single layer device will need to be patterned using two sequential single processes creates a strong coupling between the 1st and 2nd exposure. The coupling effect during the double patterning process results in extremely tight tolerances for overlay error and scanner capabilities. The purpose of this paper is to explore a new modeling method to improve lithography performance for the 32nm node. Not necessarily unique for double patterning, but as a general approach to improve overlay performance regardless of which patterning process is implemented. We will achieve this by performing an in depth source of variance analysis of current scanner performance and project the anticipated improvements from our new modeling approach. Since the new modeling approach will involve 2nd and 3rd order corrections we will also provide and analysis that outlines current metrology capabilities and sampling optimizations to further expand the opportunities of an efficient implementation of such approach.

  10. Direct imaging of the magnetic polarity and reversal mechanism in individual Fe(3-x)O4 nanoparticles.

    PubMed

    Moya, Carlos; Iglesias-Freire, Óscar; Pérez, Nicolás; Batlle, Xavier; Labarta, Amilcar; Asenjo, Agustina

    2015-05-01

    This work reports on the experimental characterization of the magnetic domain configurations in cubic, isolated Fe3-xO4 nanoparticles with a lateral size of 25-30 nm. The magnetic polarity at remanence of single domain ferrimagnetic Fe3-xO4 nanoparticles deposited onto a carbon-silicon wafer is observed by magnetic force microscopy. The orientations of these domains provide a direct observation of the magneto-crystalline easy axes in each individual nanoparticle. Furthermore, the change in the domain orientation with an external magnetic field gives evidence of particle magnetization reversal mediated by a coherent rotation process that is also theoretically predicted by micromagnetic calculations.

  11. Surface plasmon resonance response of Au-WO3- x composite films

    NASA Astrophysics Data System (ADS)

    Chen, Bo; Yang, Dongfang; Lin, Chii-Wann

    2009-11-01

    Surface plasmon resonance of metal-dielectric composite thin films formed by noble metal nanoparticles embedded in a dielectric matrix offers a high degree of flexibility and enables many applications such as surface enhanced spectroscopes, and biological and chemical sensing. In this article, Au-WO3- x composite films of various Au contents and thicknesses were prepared by the pulsed laser deposition technique, and their SPR responses were measured in the Kreschmann geometry, using a polarized light beam at 640 nm wavelength. Theoretical calculation of SPR responses based on the Bruggeman or Maxwell-Garnett model with the MacLeod general characteristic matrix method is in obvious discrepancy with experimental measurements but it is able to predict the trend in term of the dependence of SPR responses on Au content and thickness of the Au-WO3- x films. The SPR responses of the Au-WO3- x films when exposed to NO gas molecules were measured and the preliminary results indicated that gas sensing using the SPR responses of metal-dielectric composite films is feasible.

  12. Metalorganic vapor phase epitaxy growth of ternary tetradymite Bi2Te3-xSex compounds

    NASA Astrophysics Data System (ADS)

    Kuznetsov, P. I.; Yakushcheva, G. G.; Luzanov, V. A.; Temiryazev, A. G.; Shchamkhalova, B. S.; Jitov, V. A.; Sizov, V. E.

    2015-01-01

    We report on a metal organic vapor epitaxy (MOVPE) of Bi2Te3-xSex films over the entire range of compositions (0 ≤ x ≤ 3) for the first time. The films were grown on Al2O3(0001) substrates at 465 °C using trimethylbismuth (Bi2Me3), diethyltellurium (Et2Te) and diisopropylselenium (iPro2Se) as metalorganic sources. To realize the 2D growth mode and to grow films with flat surfaces and high crystalline quality, a thin ZnTe buffer layer was used. As-grown films were studied using optical and AFM microscopy techniques and X-ray diffraction. It was found that under steady growth conditions the composition of Bi2Te3-xSex films strongly depends on the film thickness. But a high rate of interdiffusion of chalcogens at the growth temperature rapidly leads to a homogeneous composition of the film in the growth direction. Dependence of the intensity of X-ray reflection (0012) on the composition of Bi2Te3-xSex films x has extremes near x=1 (Bi2Te2 Se) and x=2 (Bi2Se2 Te). The AFM micrographs and profiles show large (above 2 μm) triangle-shaped atomically flat terraces with step height of a quintuple layer (0.90 nm) of the tetradymite-type compounds. The electronic properties of the grown films have been characterized via four probe magnetotransport measurements.

  13. Maximizing the photo catalytic and photo response properties of multimodal plasmonic Ag/WO3-x heterostructure nanorods by variation of the Ag size

    NASA Astrophysics Data System (ADS)

    Ghosh, Sirshendu; Saha, Manas; Paul, Sumana; de, S. K.

    2015-10-01

    High quality nearly monodisperse colloidal WO3-x nanorods with an aspect ratio ~18 were synthesized using the thermal decomposition technique. The effects of a capping agent and an activating agent on the nanorod aspect ratio have been studied. Excess carrier concentration due to large oxygen vacancy and smaller width of the nanorods compared to the Bohr exciton radius gives rise to an increase of the band gap. Shape anisotropy in nanorods results in two plasmonic absorbance bands at about 890 nm and 5900 nm corresponding to short axis and long axis plasmon modes. The short axis mode reveals an excellent plasmonic sensitivity of ~345 nm per refractive index. A plasmonic photocatalysis process based on WO3-x nanorods has been developed to synthesize Ag/WO3-x heterostructures consisting of multiple Ag dots with ~2 nm size, randomly decorated on the surface of the WO3-x nanorods. Long time irradiation leads to an increase in the size (5 nm) of Ag nanocrystals concomitant with decrease in the number of Ag nanocrystals attached per WO3-x nanorod. Plasmonic photocatalysis followed by thermal annealing produces only one Ag nanocrystal of size ~10 nm on each WO3-x nanorod. Red shifting and broadening of plasmon bands of Ag nanocrystals and WO3-x nanorods confirm the formation of heterostructures between the metal and semiconductor. Detailed transmission electron micrograph analysis indicates the epitaxial growth of Ag nanocrystals onto WO3-x nanorods. A high photocurrent gain of about 4000 is observed for Ag (10 nm)/WO3-x heterostructures. The photodegradation rate for Rhodamine-B and methylene blue is maximum for Ag (10 nm)/WO3-x heterostructures due to efficient electron transfer from WO3-x nanorods to Ag nanocrystals. Metal plasmon-semiconductor exciton coupling, prominent plasmon absorbance of metal nanoparticles, and formation of an epitaxial interface are found to be the important factors to achieve the maximum photocatalytic activity and fabrication of a high speed

  14. Metallofullerenes encaging mixed-metal clusters: synthesis and structural studies of Gdx Ho3-x N@C80 and Gdx Lu3-x N@C80.

    PubMed

    Zhang, Zhuxia; Liu, Yang; Han, Peide; Zhuang, Shengyi; Wang, Taishan; Luo, Shuchang; Xu, Bingshe

    2015-02-01

    Metallofullerenes of Gdx Ho3-x N@C80 and Gdx Lu3-x N@C80 encapsulating mixed-metal nitride clusters were synthesized. Spectroscopic characterization of Gdx Ho3-x N@C80 and Gdx Lu3-x N@C80 was employed to reveal their structural and vibrational properties. The structural properties of these species were analyzed by using theoretical calculations. The studies of Gdx Ho3-x N@C80 and Gdx Lu3-x N@C80 laid the foundations for these species to be used as multifunctional molecules.

  15. NASA N3-X with Turboelectric Distributed Propulsion

    NASA Technical Reports Server (NTRS)

    Felder, James L.

    2014-01-01

    Presentation summarizing the phase I study of the NASA N3-X turboelectric distributed propulsion power aircraft to the IMechE Disruptive Green Propulsion Technologies conference in London, UK November 16th and 17th, 2014. This presentation contains the results of a NASA internal study funded by the NASA Fixed Wing program to look at the application of turboelectric distributed propulsion to a long-range 300 seat aircraft. The reference aircraft is the Boeing 777-200LR. The N3-X reduced energy consumption by 70 compared to the 777-200LR, LTO NOx by 85 compared to the CAEP 6 limits, and noise by 32-64 EPNdB depending on engine placement compared to the stage 4 noise standards. This exceeded the N+3 metrics of reducing energy by 60, LTO NOx by 80, and noise by 52 EPNdB. Cruise NOx was not estimated, but likely meet the 80 reduction goal as well.

  16. 7nm logic optical lithography with OPC-Lite

    NASA Astrophysics Data System (ADS)

    Smayling, Michael C.; Tsujita, Koichiro; Yaegashi, Hidetami; Axelrad, Valery; Nakayama, Ryo; Oyama, Kenichi; Yamauchi, Shohei; Ishii, Hiroyuki; Mikami, Koji

    2015-03-01

    The CMOS logic 22nm node was the last one done with single patterning. It used a highly regular layout style with Gridded Design Rules (GDR). Smaller nodes have required the same regular layout style but with multiple patterning for critical layers. A "line/cut" approach is being used to achieve good pattern fidelity and process margin.[1] As shown in Fig. 1, even with "line" patterns, pitch division will eventually be necessary. For the "cut" pattern, Design-Source-Mask Optimization (DSMO) has been demonstrated to be effective at the 20nm node and below.[2,3,4] Single patterning was found to be suitable down to 16nm, while double patterning extended optical lithography for cuts to the 10-12nm nodes. Design optimization avoided the need for triple patterning. Lines can be patterned with 193nm immersion with no complex OPC. The final line dimensions can be achieved by applying pitch division by two or four.[5] In this study, we extend the scaling using simplified OPC to the 7nm node for critical FEOL and BEOL layers. The test block is a reasonably complex logic function with ~100k gates of combinatorial logic and flip-flops, scaled from previous experiments. Simulation results show that for cuts at 7nm logic dimensions, the gate layer can be done with single patterning whose minimum pitch is 53nm, possibly some of the 1x metal layers can be done with double patterning whose minimum pitch is 53nm, and the contact layer will require triple patterning whose minimum pitch is 68nm. These pitches are less than the resolution limit of ArF NA=1.35 (72nm). However these patterns can be separated by a combination of innovative SMO for less than optical resolution limit and a process trick of hole-repair technique. An example of triple patterning coloring is shown in Fig 3. Fin and local interconnect are created by lines and trims. The number of trim patterns are 3 times (min. pitch=90nm) and twice (min. pitch=120nm), respectively. The small number of masks, large pitches, and

  17. Radiation Status of Sub-65 nm Electronics

    NASA Technical Reports Server (NTRS)

    Pellish, Jonathan A.

    2011-01-01

    Ultra-scaled complementary metal oxide semiconductor (CMOS) includes commercial foundry capabilities at and below the 65 nm technology node Radiation evaluations take place using standard products and test characterization vehicles (memories, logic/latch chains, etc.) NEPP focus is two-fold: (1) Conduct early radiation evaluations to ascertain viability for future NASA missions (i.e. leverage commercial technology development). (2) Uncover gaps in current testing methodologies and mechanism comprehension -- early risk mitigation.

  18. Superparamagnetic versus blocked states in aggregates of Fe(3-x)O₄ nanoparticles studied by MFM.

    PubMed

    Moya, Carlos; Iglesias-Freire, Óscar; Batlle, Xavier; Labarta, Amilcar; Asenjo, Agustina

    2015-11-14

    Magnetic domain configurations in two samples containing small aggregates of Fe(3-x)O4 nanoparticles of about 11 and 49 nm in size, respectively, were characterized by magnetic force microscopy (MFM). Two distinct magnetic behaviors were observed depending on the particle size. The aggregates constituted of nanoparticles of about 11 nm in size showed a uniform dark contrast on MFM images, reflecting the predominant superparamagnetic character of these particles and arising from the coherent rotation of the spins within the aggregate as the latter align along the tip stray-field. By applying a variable in-plane field, it is possible to induce magnetic polarization yielding an increasing dark/bright contrast as the strength of the applied field overcomes the stray-field of the tip, although this polarization completely disappears as the remanent state is recovered when the magnetic field is switched off. On the contrary, for aggregates of NPs of about 49 nm in size, dark/bright contrast associated with the existence of magnetic domains and magnetic polarization prevails in MFM images all along the magnetic cycle due to the blocking state of the magnetization of these larger particles, even in the absence of an applied field. All in all, we unambiguously demonstrate the capabilities of magnetic force microscopy to distinguish between blocked and superparamagnetic states in the aggregates of magnetic nanoparticles. Micromagnetic simulations strongly support the conclusions stated from the MFM experiments.

  19. Swollen lymph nodes

    MedlinePlus

    ... fingers) include: Groin Armpit Neck (there is a chain of lymph nodes on either side of the front of the neck, both sides of the neck, and down each side of the back of the neck) Under the jaw and chin Behind the ears On the back of the head

  20. XQL and Proximal Nodes.

    ERIC Educational Resources Information Center

    Baeza-Yates, Ricardo; Navarro, Gonzalo

    2002-01-01

    Discussion of models that have been developed to structure text documents for information retrieval focuses on XML and its proposed query language XQL. Considers efficiency of the query engine and shows that an already existing model, Proximal Nodes, can be used as an efficient query engine behind an XQL front-end. (Author/LRW)

  1. Sub-10 nm nanopantography

    NASA Astrophysics Data System (ADS)

    Tian, Siyuan; Donnelly, Vincent M.; Ruchhoeft, Paul; Economou, Demetre J.

    2015-11-01

    Nanopantography, a massively parallel nanopatterning method over large areas, was previously shown to be capable of printing 10 nm features in silicon, using an array of 1000 nm-diameter electrostatic lenses, fabricated on the substrate, to focus beamlets of a broad area ion beam on selected regions of the substrate. In the present study, using lens dimensional scaling optimized by computer simulation, and reduction in the ion beam image size and energy dispersion, the resolution of nanopantography was dramatically improved, allowing features as small as 3 nm to be etched into Si.

  2. Highly reproducible, efficient hysteresis-less CH3NH3PbI(3-x)Cl(x) planar hybrid solar cells without requiring heat-treatment.

    PubMed

    Heo, Jin Hyuck; Im, Sang Hyuk

    2016-02-01

    CH3NH3PbI(3-x)Cl(x)(MAPbI(3-x)Cl(x)) mixed halide perovskite powder with uniform composition was synthesized via simple solution chemistry, which demonstrates highly reproducible, efficient planar type MAPbI(3-x)Cl(x) mixed halide perovskite solar cells. Pure MAPbI(3-x)Cl(x) mixed halide perovskite powder was synthesized by reacting a 3 : 1 molar ratio of MAI : PbCl2 powder mixture in isopropanol (IPA) solution for 30 min at 60 °C with subsequent repeated centrifugation and washing in IPA. IPA functions as both the reaction medium for the formation of MAPbI(3-x)Cl(x) mixed halide and a selective remover of unreacted MAI and MACl byproducts. Accordingly, we could deposit a pinhole-free dense MAPbI(3-x)Cl(x) mixed halide perovskite film on a TiO2/FTO substrate through a simple one step spin-coating of pure MAPbI(3-x)Cl(x) mixed halide perovskite powder in DMF solution with HI additive, without further long heat-treatment processes. The deposited MAPbI(3-x)Cl(x) mixed halide perovskite film revealed uniform composition throughout the entire area, and the ratio of Cl to I + Cl and I + Cl to Pb was constant at ∼0.03 and ∼1/3, respectively. On the other hand, the conventional MAPbI(3-x)Cl(x) mixed halide perovskite film prepared by the long heat-treatment process had non-uniform composition because the ratio of Cl to I + Cl fluctuated greatly from 0 to 7.2. The average efficiency of planar type MAPbI(3-x)Cl(x) mixed halide perovskite solar cells was 18.65% ± 0.30% and the champion cell had 1.11 V V(oc), 22.1 mA cm(-2) J(sc), 77% F.F., and 18.9% η for forward scan conditions and 1.11 V V(oc), 22.1 mA cm(-2) J(sc), 78% F.F., and 19.1% η for reverse scan conditions. Although the thickness of the MAPbI(3-x)Cl(x) mixed halide perovskite layer varied from ∼500 nm to ∼900 nm, the efficiency was within the range of 18.3%-19.0%.

  3. The lymph node neutrophil.

    PubMed

    Hampton, Henry R; Chtanova, Tatyana

    2016-04-01

    Secondary lymphoid organs provide a specialized microenvironment tailored to foster communication between cells of the innate and adaptive immune systems. These interactions allow immune cells to coordinate multilayered defense against pathogens. Until recently dendritic cells and macrophages were thought to comprise the main innate immune cell subsets responsible for delivering signals that drive the adaptive immune response, while the function of neutrophils was largely confined to the innate immune system. However, the discovery of neutrophils in lymph nodes has raised the question of whether neutrophils might play a more extensive role not only in innate immunity per se, but also in coordinating the interactions between innate and adaptive immune responses. In this review we discuss the mechanisms and consequences of neutrophil recruitment to lymph nodes and how this recruitment influences subsequent immune responses both in situ and at distant sites. PMID:27025975

  4. One node driving synchronisation.

    PubMed

    Wang, Chengwei; Grebogi, Celso; Baptista, Murilo S

    2015-01-01

    Abrupt changes of behaviour in complex networks can be triggered by a single node. This work describes the dynamical fundamentals of how the behaviour of one node affects the whole network formed by coupled phase-oscillators with heterogeneous coupling strengths. The synchronisation of phase-oscillators is independent of the distribution of the natural frequencies, weakly depends on the network size, but highly depends on only one key oscillator whose ratio between its natural frequency in a rotating frame and its coupling strength is maximum. This result is based on a novel method to calculate the critical coupling strength with which the phase-oscillators emerge into frequency synchronisation. In addition, we put forward an analytical method to approximately calculate the phase-angles for the synchronous oscillators.

  5. Electron-induced single event upsets in 28 nm and 45 nm bulk SRAMs

    DOE PAGES

    Trippe, J. M.; Reed, R. A.; Austin, R. A.; Sierawski, B. D.; Weller, R. A.; Funkhouser, E. D.; King, M. P.; Narasimham, B.; Bartz, B.; Baumann, R.; et al

    2015-12-01

    In this study, we present experimental evidence of single electron-induced upsets in commercial 28 nm and 45 nm CMOS SRAMs from a monoenergetic electron beam. Upsets were observed in both technology nodes when the SRAM was operated in a low power state. The experimental cross section depends strongly on both bias and technology node feature size, consistent with previous work in which SRAMs were irradiated with low energy muons and protons. Accompanying simulations demonstrate that δ-rays produced by the primary electrons are responsible for the observed upsets. Additional simulations predict the on-orbit event rates for various Earth and Jovian environmentsmore » for a set of sensitive volumes representative of current technology nodes. The electron contribution to the total upset rate for Earth environments is significant for critical charges as high as 0.2 fC. This value is comparable to that of sub-22 nm bulk SRAMs. Similarly, for the Jovian environment, the electron-induced upset rate is larger than the proton-induced upset rate for critical charges as high as 0.3 fC.« less

  6. Electron-induced single event upsets in 28 nm and 45 nm bulk SRAMs

    SciTech Connect

    Trippe, J. M.; Reed, R. A.; Austin, R. A.; Sierawski, B. D.; Weller, R. A.; Funkhouser, E. D.; King, M. P.; Narasimham, B.; Bartz, B.; Baumann, R.; Schrimpf, R. D.; Labello, R.; Nichols, J.; Weeden-Wright, S. L.

    2015-12-01

    In this study, we present experimental evidence of single electron-induced upsets in commercial 28 nm and 45 nm CMOS SRAMs from a monoenergetic electron beam. Upsets were observed in both technology nodes when the SRAM was operated in a low power state. The experimental cross section depends strongly on both bias and technology node feature size, consistent with previous work in which SRAMs were irradiated with low energy muons and protons. Accompanying simulations demonstrate that δ-rays produced by the primary electrons are responsible for the observed upsets. Additional simulations predict the on-orbit event rates for various Earth and Jovian environments for a set of sensitive volumes representative of current technology nodes. The electron contribution to the total upset rate for Earth environments is significant for critical charges as high as 0.2 fC. This value is comparable to that of sub-22 nm bulk SRAMs. Similarly, for the Jovian environment, the electron-induced upset rate is larger than the proton-induced upset rate for critical charges as high as 0.3 fC.

  7. Determination of complex index of immersion liquids at 193 nm

    NASA Astrophysics Data System (ADS)

    Stehle, Jean-Louis; Piel, Jean-Philippe; Campillo-Carreto, Jose

    2006-03-01

    The next nodes in immersion lithography will require the scanners to use the 193 nm ArF* laser line with a very large numerical aperture and a liquid between the optics and the resist. (1) Immersion lithography at 193 nm requests very specific parameters for the fluid. The first generation is using the deionized Water (DIW) very pure and not recycled, but when a new optical material for the last lens will be available with a refractive index (RI) larger than 1.85, a higher refractive index fluid could be used, enabling second and maybe third generation of immersion lithography at 193 nm. So the 45 and maybe the 32 nm nodes could be covered with this high Index fluids (HIF).

  8. Highly reproducible, efficient hysteresis-less CH3NH3PbI3-xClx planar hybrid solar cells without requiring heat-treatment

    NASA Astrophysics Data System (ADS)

    Heo, Jin Hyuck; Im, Sang Hyuk

    2016-01-01

    CH3NH3PbI3-xClx(MAPbI3-xClx) mixed halide perovskite powder with uniform composition was synthesized via simple solution chemistry, which demonstrates highly reproducible, efficient planar type MAPbI3-xClx mixed halide perovskite solar cells. Pure MAPbI3-xClx mixed halide perovskite powder was synthesized by reacting a 3 : 1 molar ratio of MAI : PbCl2 powder mixture in isopropanol (IPA) solution for 30 min at 60 °C with subsequent repeated centrifugation and washing in IPA. IPA functions as both the reaction medium for the formation of MAPbI3-xClx mixed halide and a selective remover of unreacted MAI and MACl byproducts. Accordingly, we could deposit a pinhole-free dense MAPbI3-xClx mixed halide perovskite film on a TiO2/FTO substrate through a simple one step spin-coating of pure MAPbI3-xClx mixed halide perovskite powder in DMF solution with HI additive, without further long heat-treatment processes. The deposited MAPbI3-xClx mixed halide perovskite film revealed uniform composition throughout the entire area, and the ratio of Cl to I + Cl and I + Cl to Pb was constant at ~0.03 and ~1/3, respectively. On the other hand, the conventional MAPbI3-xClx mixed halide perovskite film prepared by the long heat-treatment process had non-uniform composition because the ratio of Cl to I + Cl fluctuated greatly from 0 to 7.2. The average efficiency of planar type MAPbI3-xClx mixed halide perovskite solar cells was 18.65% +/- 0.30% and the champion cell had 1.11 V Voc, 22.1 mA cm-2Jsc, 77% F.F., and 18.9% η for forward scan conditions and 1.11 V Voc, 22.1 mA cm-2Jsc, 78% F.F., and 19.1% η for reverse scan conditions. Although the thickness of the MAPbI3-xClx mixed halide perovskite layer varied from ~500 nm to ~900 nm, the efficiency was within the range of 18.3%-19.0%.CH3NH3PbI3-xClx(MAPbI3-xClx) mixed halide perovskite powder with uniform composition was synthesized via simple solution chemistry, which demonstrates highly reproducible, efficient planar type MAPbI3-x

  9. Albuquerque, NM, USA

    NASA Technical Reports Server (NTRS)

    1991-01-01

    Albuquerque, NM (35.0N, 106.5W) is situated on the edge of the Rio Grande River and flood plain which cuts across the image. The reddish brown surface of the Albuquerque Basin is a fault depression filled with ancient alluvial fan and lake bed sediments. On the slopes of the Manzano Mountains to the east of Albuquerque, juniper and other timber of the Cibola National Forest can be seen as contrasting dark tones of vegetation.

  10. Coarse-node computations with an adaptive node structure

    SciTech Connect

    Tzanos, C.P.

    1988-01-01

    The analysis with COMMIX of liquid metal reactor (LMR) intermediate heat exchanger (IHX) transients that are characterized by low flows, and especially imbalanced low flows, shows that if a coarse-node structure is used the predicted temperatures are significantly different than those given by a fine-node structure. If a fine-node structure is used, for problems that involve a large part of the plant, the computation time becomes excessive. This paper presents an improved version of an adaptive node structure. At this stage this version has been applied only to one-dimensional problems.

  11. Compression in wearable sensor nodes: impacts of node topology.

    PubMed

    Imtiaz, Syed Anas; Casson, Alexander J; Rodriguez-Villegas, Esther

    2014-04-01

    Wearable sensor nodes monitoring the human body must operate autonomously for very long periods of time. Online and low-power data compression embedded within the sensor node is therefore essential to minimize data storage/transmission overheads. This paper presents a low-power MSP430 compressive sensing implementation for providing such compression, focusing particularly on the impact of the sensor node architecture on the compression performance. Compression power performance is compared for four different sensor nodes incorporating different strategies for wireless transmission/on-sensor-node local storage of data. The results demonstrate that the compressive sensing used must be designed differently depending on the underlying node topology, and that the compression strategy should not be guided only by signal processing considerations. We also provide a practical overview of state-of-the-art sensor node topologies. Wireless transmission of data is often preferred as it offers increased flexibility during use, but in general at the cost of increased power consumption. We demonstrate that wireless sensor nodes can highly benefit from the use of compressive sensing and now can achieve power consumptions comparable to, or better than, the use of local memory.

  12. Compression in wearable sensor nodes: impacts of node topology.

    PubMed

    Imtiaz, Syed Anas; Casson, Alexander J; Rodriguez-Villegas, Esther

    2014-04-01

    Wearable sensor nodes monitoring the human body must operate autonomously for very long periods of time. Online and low-power data compression embedded within the sensor node is therefore essential to minimize data storage/transmission overheads. This paper presents a low-power MSP430 compressive sensing implementation for providing such compression, focusing particularly on the impact of the sensor node architecture on the compression performance. Compression power performance is compared for four different sensor nodes incorporating different strategies for wireless transmission/on-sensor-node local storage of data. The results demonstrate that the compressive sensing used must be designed differently depending on the underlying node topology, and that the compression strategy should not be guided only by signal processing considerations. We also provide a practical overview of state-of-the-art sensor node topologies. Wireless transmission of data is often preferred as it offers increased flexibility during use, but in general at the cost of increased power consumption. We demonstrate that wireless sensor nodes can highly benefit from the use of compressive sensing and now can achieve power consumptions comparable to, or better than, the use of local memory. PMID:24658233

  13. Eu(2+)-Activated Alkaline-Earth Halophosphates, M5(PO4)3X:Eu(2+) (M = Ca, Sr, Ba; X = F, Cl, Br) for NUV-LEDs: Site-Selective Crystal Field Effect.

    PubMed

    Kim, Donghyeon; Kim, Sung-Chul; Bae, Jong-Seong; Kim, Sungyun; Kim, Seung-Joo; Park, Jung-Chul

    2016-09-01

    Eu(2+)-activated M5(PO4)3X (M = Ca, Sr, Ba; X = F, Cl, Br) compounds providing different alkaline-earth metal and halide ions were successfully synthesized and characterized. The emission peak maxima of the M5(PO4)3Cl:Eu(2+) (M = Ca, Sr, Ba) compounds were blue-shifted from Ca to Ba (454 nm for Ca, 444 nm for Sr, and 434 nm for Ba), and those of the Sr5(PO4)3X:Eu(2+) (X = F, Cl, Br) compounds were red-shifted along the series of halides, F → Cl → Br (437 nm for F, 444 nm for Cl, and 448 nm for Br). The site selectivity and occupancy of the activator ions (Eu(2+)) in the M5(PO4)3X:Eu(2+) (M = Ca, Sr, Ba; X = F, Cl, Br) crystal lattices were estimated based on theoretical calculation of the 5d → 4f transition energies of Eu(2+) using LCAO. In combination with the photoluminescence measurements and theoretical calculation, it was elucidated that the Eu(2+) ions preferably enter the fully oxygen-coordinated sites in the M5(PO4)3X:Eu(2+) (M = Ca, Sr, Ba; X = F, Cl, Br) compounds. This trend can be well explained by "Pauling's rules". These compounds may provide a platform for modeling a new phosphor and application in the solid-state lighting field. PMID:27494550

  14. 11nm logic lithography with OPC-lite

    NASA Astrophysics Data System (ADS)

    Smayling, Michael C.; Tsujita, Koichiro; Yaegashi, Hidetami; Axelrad, Valery; Nakayama, Ryo; Oyama, Kenichi; Hara, Arisa

    2014-03-01

    CMOS logic at the 22nm node and below is being done with a highly regular layout style using Gridded Design Rules (GDR). Smaller nodes have been demonstrated using a "lines and cuts" approach with good pattern fidelity and process margin, with extendibility to ~7nm.[1] In previous studies, Design-Source-Mask Optimization (DSMO) has been demonstrated to be effective down to the 12nm node.[2,3,4,5,6] The transition from single- to double- and in some cases triple- patterning was evaluated for different layout styles, with highly regular layouts delaying the need for multiple-patterning compared to complex layouts. To address mask complexity and cost, OPC for the "cut" patterns was studied and relatively simple OPC was found to provide good quality metrics such as MEEF and DOF.[3,7,8] This is significant since mask data volumes of >500GB per layer are projected for pixelated masks created by complex OPC or inverse lithography; writing times for such masks are nearly prohibitive. In our present work, we extend the scaling using SMO with "OPC Lite" beyond 12nm. The focus is on the contact pattern since a "hole" pattern is similar to a "cut" pattern so a similar technique should be useful. The test block is a reasonably complex logic function with ~100k gates of combinatorial logic and flip-flops, scaled from previous studies. The contact pattern is a relatively dense layer since it connects two underlying layers - active and gate - to one overlying layer - metal-1. Several design iterations were required to get suitable layouts while maintaining circuit functionality. Experimental demonstration of the contact pattern using OPC-Lite will be presented. Wafer results have been obtained at a metal-1 half-pitch of 18nm, corresponding to the 11nm CMOS node. Additional results for other layers - FINs, local interconnect, and metal-1 - will also be discussed.

  15. Cancer-associated DDX3X mutations drive stress granule assembly and impair global translation

    PubMed Central

    Valentin-Vega, Yasmine A.; Wang, Yong-Dong; Parker, Matthew; Patmore, Deanna M.; Kanagaraj, Anderson; Moore, Jennifer; Rusch, Michael; Finkelstein, David; Ellison, David W.; Gilbertson, Richard J.; Zhang, Jinghui; Kim, Hong Joo; Taylor, J. Paul

    2016-01-01

    DDX3X is a DEAD-box RNA helicase that has been implicated in multiple aspects of RNA metabolism including translation initiation and the assembly of stress granules (SGs). Recent genomic studies have reported recurrent DDX3X mutations in numerous tumors including medulloblastoma (MB), but the physiological impact of these mutations is poorly understood. Here we show that a consistent feature of MB-associated mutations is SG hyper-assembly and concomitant translation impairment. We used CLIP-seq to obtain a comprehensive assessment of DDX3X binding targets and ribosome profiling for high-resolution assessment of global translation. Surprisingly, mutant DDX3X expression caused broad inhibition of translation that impacted DDX3X targeted and non-targeted mRNAs alike. Assessment of translation efficiency with single-cell resolution revealed that SG hyper-assembly correlated precisely with impaired global translation. SG hyper-assembly and translation impairment driven by mutant DDX3X were rescued by a genetic approach that limited SG assembly and by deletion of the N-terminal low complexity domain within DDX3X. Thus, in addition to a primary defect at the level of translation initiation caused by DDX3X mutation, SG assembly itself contributes to global translation inhibition. This work provides mechanistic insights into the consequences of cancer-related DDX3X mutations, suggesting that globally reduced translation may provide a context-dependent survival advantage that must be considered as a possible contributor to tumorigenesis. PMID:27180681

  16. [Lymph node metastasis of osteosarcomas].

    PubMed

    Vasil'ev, N V

    2016-01-01

    Lymph node metastasis of osteosarcomas is a rather rare phenomenon; according to different authors, the incidence of lymph node metastasis is 4 to 11%. The detection of lymph node metastases in osteosarcoma is associated with a significant reduction in the 5-year survival of patients and allows its classification as clinical stage IV tumor. The risk factors for lymph node metastases in patients with bone sarcomas are age (≥64 years), gender (female), nosological entity (undifferentiated pleomorphic sarcoma, osteosarcoma, chondrosarcoma), tumor depth (muscle, bone), and the size of primary tumor (>5 сm). The mechanism of lymph node metastasis of osteosarcomas seems to be related to mesenchymal-to-epithelial transition. PMID:27600784

  17. Lymph node mapping using quantum dot-labeled polymersomes.

    PubMed

    Bakalova, Rumiana; Zhelev, Zhivko; Nikolova, Biliana; Murayama, Shuhei; Lazarova, Desislava; Tsoneva, Iana; Aoki, Ichio

    2015-10-01

    The present study was designed to investigate whether poly-ion complex hollow vesicles (polymersomes), based on chemically-modified chitosan, are appropriate for lymph node mapping in the context of their application in the development of theranostic nanosized drug delivery systems (nano-DDS). The experiments were performed on Balb/c nude mice (colon cancer-grafted). The mice were subjected to anesthesia and quantum dot (QD(705))-labeled polymersomes (d-120 nm) were injected intravenously via the tail vein. The optical imaging was carried out on Maestro EX Imaging System (excitation filter: 435-480 nm; emission filter: 700 nm). A strong fluorescent signal, corresponding to QD(705) fluorescence, was detected in the lymph nodes, as well as in the tumor. A very weak fluorescent signal was found in the liver area. The half-life of QD(705)-labelled polymersomes was 6 ± 2 hours in the bloodstream and 11 ± 3 hours in the lymph nodes. The data suggest that polymersomes are very promising carriers for lymph node mapping using QD as a contrast agent. They are useful matrix for development of nano-formulations with theranostic capabilities.

  18. Connecting node and method for constructing a connecting node

    NASA Technical Reports Server (NTRS)

    Johnson, Christopher J. (Inventor); Raboin, Jasen L. (Inventor); Spexarth, Gary R. (Inventor)

    2011-01-01

    A connecting node comprises a polyhedral structure comprising a plurality of panels joined together at its side edges to form a spherical approximation, wherein at least one of the plurality of panels comprises a faceted surface being constructed with a passage for integrating with one of a plurality of elements comprising a docking port, a hatch, and a window that is attached to the connecting node. A method for manufacturing a connecting node comprises the steps of providing a plurality of panels, connecting the plurality of panels to form a spherical approximation, wherein each edge of each panel of the plurality is joined to another edge of another panel, and constructing at least one of the plurality of panels to include a passage for integrating at least one of a plurality of elements that may be attached to the connecting node.

  19. CONTEXT VIEW, SHOWING STRUCTURE NO. 57.3X (CULVERT) AT RIGHT AND ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    CONTEXT VIEW, SHOWING STRUCTURE NO. 57.3X (CULVERT) AT RIGHT AND STRUCTURE NO. 57.24X (BRIDGE) IN DISTANCE AT LEFT. MAIN TRACK 1 RUNS ALONG THE TOP OF THE FEATURES. VIEW TO THE SOUTHEAST. 12 - Burlington Northern Santa Fe Railroad, Cajon Subdivision, Structure No. 57.3X, Between Cajon Summit and Keenbrook, Devore, San Bernardino County, CA

  20. Combustion synthesis of Sm 0.5Sr 0.5CoO 3- x and La 0.6Sr 0.4CoO 3- x nanopowders for solid oxide fuel cell cathodes

    NASA Astrophysics Data System (ADS)

    Bansal, Narottam P.; Zhong, Zhimin

    Nanopowders of Sm 0.5Sr 0.5CoO 3- x (SSC) and La 0.6Sr 0.4CoO 3- x (LSC) compositions, which are being investigated as cathode materials for intermediate temperature solid oxide fuel cells (SOFC), were synthesized by a solution-combustion method using metal nitrates and glycine as fuel. Development of crystalline phases in the as-synthesized powders after heat treatments at various temperatures was monitored by X-ray diffraction (XRD). Perovskite phase in LSC formed more readily than in SSC. Single-phase perovskites were obtained after heat treatment of the combustion synthesized LSC and SSC powders at 1000 and 1200 °C, respectively. The as-synthesized powders had an average particle size of ∼12 nm as determined from X-ray line broadening analysis using the Scherrer equation. Average grain size of the powders increased with increase in calcination temperature. Morphological analysis of the powders calcined at various temperatures was done by scanning electron microscopy (SEM).

  1. Combustion Synthesis of Sm0.5Sr0.5CoO3-x and La0.6Sr0.4CoO3-x Nanopowders for Solid Oxide Fuel Cell Cathodes

    NASA Technical Reports Server (NTRS)

    Bansal, Narottam P.; Zhong, zhimin

    2005-01-01

    Nanopowders of Sm0.5Sr0.5CoO(3-x) (SSC) and La0.6Sr0.4CoO(3-x) (LSC) compositions, which are being investigated as cathode materials for intermediate temperature solid oxide fuel cells, were synthesized by a solution-combustion method using metal nitrates and glycine as fuel. Development of crystalline phases in the as-synthesized powders after heat treatments at various temperatures was monitored by x-ray diffraction. Perovskite phase in LSC formed more readily than in SSC. Single phase perovskites were obtained after heat treatment of the combustion synthesized LSC and SSC powders at 1000 and 1200 C, respectively. The as-synthesized powders had an average particle size of 12 nm as determined from x-ray line broadening analysis using the Scherrer equation. Average grain size of the powders increased with increase in calcination temperature. Morphological analysis of the powders calcined at various temperatures was done by scanning electron microscopy.

  2. Evaluation of BC2 progenies derived from 3x-2x and 3x-4x crosses of Lilium hybrids: a GISH analysis.

    PubMed

    Lim, K-B; Ramanna, M S; Jacobsen, E; van Tuyl, J M

    2003-02-01

    An allotriploid (ALA, 2n=3 x=36) BC(1) plant was obtained by backcrossing a diploid F(1) interspecific hybrid (LA, 2n=2 x=24), derived from a Lilium longiflorum (L genome) and an Asiatic hybrid (A genome), to the latter parent. This allotriploid was backcrossed to a diploid Asiatic hybrid (2n=2 x=24) and to an allotetraploid (LLAA, 2n=4 x=48) LA hybrid. A total of 25 plants of these crosses were examined for ploidy level, and 12 individuals were analyzed for their genome constitution through genomic in situ hybridization (GISH). In most cases the progenies from the triploid-diploid (3 x-2 x) crosses consisted of aneuploids. Further more, there was evidence for the formation of near-haploid (x=12+2) to triploid (3 x=36) gametes in the allotriploid BC(1) plant. The progenies of triploid-tetraploid (3 x-4 x) cross also consisted of mostly aneuploids but in this case the triploid female parent had contributed predominantly near-triploid (2n) gametes for the origin of BC(2) progenies. The different ploidy levels observed between 3 x-2 x and 3 x-4 x crosses are possibly caused by preferential fertilization or survival resulting in a different ratio of chromosome numbers between the embryo and endosperm. Though Lilium has a tetrasporic, eight-nucleate type of embryo sac formation (Fritillaria type), the observed difference between the progeny types in 3 x-2 x and 3 x-4 x crosses is comparable to that of observed in monosporic eight nucleate types (Polygonum type) that predominate in most genera of Angiosperms. An important feature of the genome constitution of the progenies was that the homoeologous recombinant chromosomes were transmitted intact from BC(1) to BC(2) progenies in variable numbers. In addition, there was evidence for the occurrence of new homoeologous recombinations in the triploid BC(1). Of the two euploid BC(2) plants one had originated through the parthenogenetic development of a 2n egg and the other had originated through indeterminate meiotic

  3. Node weighted network upgrade problems

    SciTech Connect

    Krumke, S.O.; Noltemeier, H.; Marathe, M.V.; Ravi, S.S.

    1996-09-01

    Consider a network where nodes represent processors and edges represent bidirectional communication links. The processor at a node v can be upgraded at an expense of cost(v). Such an upgrade reduces the delay of each link emanating from v by a fixed factor x, where 0 < x < 1. The goal is to find a minimum cost set of nodes to be upgraded so that the resulting network has a spanning tree in which edge is of delay at most a given value {delta}. The authors provide both hardness and approximation results for the problem. They show that the problem is NP-hard and cannot be approximated within any factor {beta} < ln n, unless NP {improper_subset} DTIME(n{sup log log n}), where n is the number of nodes in the network. They then present the first polynomial time approximation algorithms for the problem. For the general case, the approximation algorithm comes within a factor of 2 ln n of the minimum upgrading cost. When the cost of upgrading each node is 1, they present an approximation algorithm with a performance guarantee of 4(2 + ln {Delta}), where {Delta} is the maximum node degree. Finally, they present a polynomial time algorithm for the class of treewidth-bounded graphs.

  4. One-pot synthesis of PEGylated plasmonic MoO(3-x) hollow nanospheres for photoacoustic imaging guided chemo-photothermal combinational therapy of cancer.

    PubMed

    Bao, Tao; Yin, Wenyan; Zheng, Xiaopeng; Zhang, Xiao; Yu, Jie; Dong, Xinghua; Yong, Yuan; Gao, Fuping; Yan, Liang; Gu, Zhanjun; Zhao, Yuliang

    2016-01-01

    Engineering design of plasmonic nanomaterials as on-demand theranostic nanoagents with imaging, drug carrier, and photothermal therapy (PTT) functions have profound impact on treatment of cancer. Here, a facile 'one-pot' template-free hydrothermal route was firstly developed for synthesis of plasmonic oxygen deficiency molybdenum oxide hollow nanospheres functionalized by poly(ethylene glycol) (PEG-MoO(3-x) HNSs). The as-prepared PEG-MoO(3-x) HNSs not only have good biocompatibility but also exhibit obvious localized surface plasmon resonance (LSPR) absorption in the near-infrared (NIR) region. Especially, due to its intrinsic mesoporous properties and effective photothermal conversion efficiency upon 808-nm NIR laser irradiation, the PEG-MoO(3-x) HNSs can be applied as a pH/NIR laser dual-responsive camptothecin (CPT) drug delivery nanoplatform for chemotherapy as well as PTT to cancer cells. A remarkably improved synergistic therapeutic effect to pancreatic (PANC-1) tumor-bearing mice was obtained compared to the result of chemotherapy or PTT alone. Apart from its application for drug delivery, the PEG-MoO(3-x) HNSs can also be employed as an effective contrast nanoagent for photoacoustic (PAT) imaging because of its high NIR absorption, making it promising as a theranostic nanoagent for PAT imaging-guided chemo-photothermal combinational cancer therapy in the nanomedicine field.

  5. Luminescence properties of a novel promising red phosphor Na3Gd2-x(BO3)3:xEu3+

    NASA Astrophysics Data System (ADS)

    Wei, Tengyue; Ren, Qiang; Wu, Xiulan; Shi, Xiaolei; Wang, Baoxing; Huo, Zhezhe

    2016-11-01

    The novel red-emitting Na3Gd2-x(BO3)3:xEu3+ phosphors were synthesized by a solid-state method. Under near ultraviolet excitation, the phosphors exhibit dominant emission peak at 614 nm and generate bright red light, which is attributed to the electric-dipole transition 5D0→7F2. The optimal doping amount of Eu3+ in Na3Gd2-x(BO3)3:xEu3+ phosphors is x=0.3 for the maximum emission. The exchange interaction between Eu3+ ions is identified to be the main mechanism in the concentration quenching process. The CIE color coordinates of the Na3Gd2-x(BO3)3:xEu3+ phosphors (x=0.650, y=0.350) are close to the NTSC standard values of red. With a relatively high quantum efficiency of 35.2%, Na3Gd2-x(BO3)3:xEu3+ red-emitting phosphor is probably a promising candidate for near ultraviolet-based white LEDs application.

  6. Superparamagnetic versus blocked states in aggregates of Fe3-xO4 nanoparticles studied by MFM

    NASA Astrophysics Data System (ADS)

    Moya, Carlos; Iglesias-Freire, Óscar; Batlle, Xavier; Labarta, Amilcar; Asenjo, Agustina

    2015-10-01

    Magnetic domain configurations in two samples containing small aggregates of Fe3-xO4 nanoparticles of about 11 and 49 nm in size, respectively, were characterized by magnetic force microscopy (MFM). Two distinct magnetic behaviors were observed depending on the particle size. The aggregates constituted of nanoparticles of about 11 nm in size showed a uniform dark contrast on MFM images, reflecting the predominant superparamagnetic character of these particles and arising from the coherent rotation of the spins within the aggregate as the latter align along the tip stray-field. By applying a variable in-plane field, it is possible to induce magnetic polarization yielding an increasing dark/bright contrast as the strength of the applied field overcomes the stray-field of the tip, although this polarization completely disappears as the remanent state is recovered when the magnetic field is switched off. On the contrary, for aggregates of NPs of about 49 nm in size, dark/bright contrast associated with the existence of magnetic domains and magnetic polarization prevails in MFM images all along the magnetic cycle due to the blocking state of the magnetization of these larger particles, even in the absence of an applied field. All in all, we unambiguously demonstrate the capabilities of magnetic force microscopy to distinguish between blocked and superparamagnetic states in the aggregates of magnetic nanoparticles. Micromagnetic simulations strongly support the conclusions stated from the MFM experiments.Magnetic domain configurations in two samples containing small aggregates of Fe3-xO4 nanoparticles of about 11 and 49 nm in size, respectively, were characterized by magnetic force microscopy (MFM). Two distinct magnetic behaviors were observed depending on the particle size. The aggregates constituted of nanoparticles of about 11 nm in size showed a uniform dark contrast on MFM images, reflecting the predominant superparamagnetic character of these particles and arising

  7. Comparison of Raw Acceleration from the GENEA and ActiGraph™ GT3X+ Activity Monitors

    PubMed Central

    John, Dinesh; Sasaki, Jeffer; Staudenmayer, John; Mavilia, Marianna; Freedson, Patty S.

    2013-01-01

    Purpose: To compare raw acceleration output of the ActiGraph™ GT3X+ and GENEA activity monitors. Methods: A GT3X+ and GENEA were oscillated in an orbital shaker at frequencies ranging from 0.7 to 4.0 Hz (ten 2-min trials/frequency) on a fixed radius of 5.08 cm. Additionally, 10 participants (age = 23.8 ± 5.4 years) wore the GT3X+ and GENEA on the dominant wrist and performed treadmill walking (2.0 and 3.5 mph) and running (5.5 and 7.5 mph) and simulated free-living activities (computer work, cleaning a room, vacuuming and throwing a ball) for 2-min each. A linear mixed model was used to compare the mean triaxial vector magnitude (VM) from the GT3X+ and GENEA at each oscillation frequency. For the human testing protocol, random forest machine-learning technique was used to develop two models using frequency domain (FD) and time domain (TD) features for each monitor. We compared activity type recognition accuracy between the GT3X+ and GENEA when the prediction model was fit using one monitor and then applied to the other. Z-statistics were used to compare the proportion of accurate predictions from the GT3X+ and GENEA for each model. Results: GENEA produced significantly higher (p < 0.05, 3.5 to 6.2%) mean VM than GT3X+ at all frequencies during shaker testing. Training the model using TD input features on the GENEA and applied to GT3X+ data yielded significantly lower (p < 0.05) prediction accuracy. Prediction accuracy was not compromised when interchangeably using FD models between monitors. Conclusions: It may be inappropriate to apply a model developed on the GENEA to predict activity type using GT3X+ data when input features are TD attributes of raw acceleration. PMID:24177727

  8. Node, Node-Link, and Node-Link-Group Diagrams: An Evaluation.

    PubMed

    Saket, Bahador; Simonetto, Paolo; Kobourov, Stephen; Börner, Katy

    2014-12-01

    Effectively showing the relationships between objects in a dataset is one of the main tasks in information visualization. Typically there is a well-defined notion of distance between pairs of objects, and traditional approaches such as principal component analysis or multi-dimensional scaling are used to place the objects as points in 2D space, so that similar objects are close to each other. In another typical setting, the dataset is visualized as a network graph, where related nodes are connected by links. More recently, datasets are also visualized as maps, where in addition to nodes and links, there is an explicit representation of groups and clusters. We consider these three Techniques, characterized by a progressive increase of the amount of encoded information: node diagrams, node-link diagrams and node-link-group diagrams. We assess these three types of diagrams with a controlled experiment that covers nine different tasks falling broadly in three categories: node-based tasks, network-based tasks and group-based tasks. Our findings indicate that adding links, or links and group representations, does not negatively impact performance (time and accuracy) of node-based tasks. Similarly, adding group representations does not negatively impact the performance of network-based tasks. Node-link-group diagrams outperform the others on group-based tasks. These conclusions contradict results in other studies, in similar but subtly different settings. Taken together, however, such results can have significant implications for the design of standard and domain snecific visualizations tools. PMID:26356937

  9. LCP nanoparticle for tumor and lymph node metastasis imaging

    NASA Astrophysics Data System (ADS)

    Tseng, Yu-Cheng

    A lipid/calcium/phosphate (LCP) nanoparticle formulation (particle diameter ˜25 nm) has previously been developed to delivery siRNA with superior efficiency. In this work, 111In was formulated into LCP nanoparticles to form 111In-LCP for SPECT/CT imaging. With necessary modifications and improvements of the LCP core-washing and surface-coating methods, 111In-LCP grafted with polyethylene glycol exhibited reduced uptake by the mononuclear phagocytic system. SPECT/CT imaging supported performed biodistribution studies, showing clear tumor images with accumulation of 8% or higher injected dose per gram tissue (ID/g) in subcutaneous, human-H460, lung-cancer xenograft and mouse-4T1, breast cancer metastasis models. Both the liver and the spleen accumulated ˜20% ID/g. Accumulation in the tumor was limited by the enhanced permeation and retention effect and was independent of the presence of a targeting ligand. A surprisingly high accumulation in the lymph nodes (˜70% ID/g) was observed. In the 4T1 lymph node metastasis model, the capability of intravenously injected 111In-LCP to visualize the size-enlarged and tumor-loaded sentinel lymph node was demonstrated. By analyzing the SPECT/CT images taken at different time points, the PK profiles of 111In-LCP in the blood and major organs were determined. The results indicated that the decrement of 111In-LCP blood concentration was not due to excretion, but to tissue penetration, leading to lymphatic accumulation. Larger LCP (diameter ˜65 nm) nanoparticles were also prepared for the purpose of comparison. Results indicated that larger LCP achieved slightly lower accumulation in the tumor and lymph nodes, but much higher accumulation in the liver and spleen; thus, larger nanoparticles might not be favorable for imaging purposes. We also demonstrated that LCP with a diameter of ˜25 nm were better able to penetrate into tissues, travel in the lymphatic system and preferentially accumulate in the lymph nodes due to 1) small

  10. Anatomy and histology of Virchow's node.

    PubMed

    Mizutani, Masaomi; Nawata, Shin-ichi; Hirai, Ichiro; Murakami, Gen; Kimura, Wataru

    2005-12-01

    A regional lymphatic system is composed of the first, second, third and even fourth or much more intercalated nodes along the lymptatic route from the periphery to the venous angle or the thoracic duct. The third or fourth node is usually termed the last-intercalated node or end node along the route. Similarly, one of the supraclavicular nodes is known to correspond to the end node along the thoracic duct. It is generally called 'Virchow's node', in which the famous 'Virchow's metastasis' of advanced gastric cancer occurs. The histology of this node has not been investigated, although region-specific differences in histology are evident in human lymph nodes. We found macroscopically the end node in five of 30 donated cadavers. Serial sections were prepared for these five nodes and sections stained with hematoxylin and eosin. Histological investigation revealed that, on the inferior or distal side of the end node, the thoracic duct divided into three to 10 collateral ducts and these ducts surrounded the node. The node communicated with the thoracic duct and its collaterals at multiple sites in two to three hilus-like portions, as well as along the subcapsular sinus. Thus, the end node was aligned parallel to the thoracic duct. Moreover, the superficial and deep cortex areas of the end node were fragmented to make an island-like arrangement, which may cause the short-cut intranodal shunt. Consequenly, the filtration function of most of Virchow's node seemed to be quite limited.

  11. Dual-color photoacoustic lymph node imaging using nanoformulated naphthalocyanines.

    PubMed

    Lee, Changho; Kim, Jeesu; Zhang, Yumiao; Jeon, Mansik; Liu, Chengbo; Song, Liang; Lovell, Jonathan F; Kim, Chulhong

    2015-12-01

    Demarking lymph node networks is important for cancer staging in clinical practice. Here, we demonstrate in vivo dual-color photoacoustic lymphangiography using all-organic nanoformulated naphthalocyanines (referred to as nanonaps). Nanonap frozen micelles were self-assembled from two different naphthalocyanine dyes with near-infrared absorption at 707 nm or 860 nm. These allowed for noninvasive, nonionizing, high resolution photoacoustic identification of separate lymphatic drainage systems in vivo. With both types of nanonaps, rat lymph nodes buried deeply below an exogenously-placed 10 mm thick layer of chicken breast were clearly visualized in vivo. These results show the potential of multispectral photoacoustic imaging with nanonaps for detailed mapping of lymphatic drainage systems. PMID:26408999

  12. Dual-color photoacoustic lymph node imaging using nanoformulated naphthalocyanines.

    PubMed

    Lee, Changho; Kim, Jeesu; Zhang, Yumiao; Jeon, Mansik; Liu, Chengbo; Song, Liang; Lovell, Jonathan F; Kim, Chulhong

    2015-12-01

    Demarking lymph node networks is important for cancer staging in clinical practice. Here, we demonstrate in vivo dual-color photoacoustic lymphangiography using all-organic nanoformulated naphthalocyanines (referred to as nanonaps). Nanonap frozen micelles were self-assembled from two different naphthalocyanine dyes with near-infrared absorption at 707 nm or 860 nm. These allowed for noninvasive, nonionizing, high resolution photoacoustic identification of separate lymphatic drainage systems in vivo. With both types of nanonaps, rat lymph nodes buried deeply below an exogenously-placed 10 mm thick layer of chicken breast were clearly visualized in vivo. These results show the potential of multispectral photoacoustic imaging with nanonaps for detailed mapping of lymphatic drainage systems.

  13. Swiss EMBnet node web server.

    PubMed

    Falquet, Laurent; Bordoli, Lorenza; Ioannidis, Vassilios; Pagni, Marco; Jongeneel, C Victor

    2003-07-01

    EMBnet is a consortium of collaborating bioinformatics groups located mainly within Europe (http://www.embnet.org). Each member country is represented by a 'node', a group responsible for the maintenance of local services for their users (e.g. education, training, software, database distribution, technical support, helpdesk). Among these services a web portal with links and access to locally developed and maintained software is essential and different for each node. Our web portal targets biomedical scientists in Switzerland and elsewhere, offering them access to a collection of important sequence analysis tools mirrored from other sites or developed locally. We describe here the Swiss EMBnet node web site (http://www.ch.embnet.org), which presents a number of original services not available anywhere else.

  14. Epitaxial growth and piezoelectric characterization of the (1-x)BiScO{sub 3}-(x)PbTiO{sub 3} ultrathin film

    SciTech Connect

    Wu, Youngsoo; Jin, Yeryeong; Kim, Bongju; Kwon, Daeyoung; Kim, Bog G.

    2011-03-15

    We studied ferroelectric properties of morphotropic phase boundary (1-x)BiScO{sub 3}-(x)PbTiO{sub 3} (BSPT, x = 0.64) epitaxial thin films on SrTiO{sub 3} (001) and Nb:SrTiO{sub 3} (001). BSPT thin films with various thicknesses were deposited using off-axis radio frequency magnetron sputtering. By analyzing x-ray data of BSPT thin films with various thicknesses, we confirmed that films thinner than {approx}22 nm were in a strained state. Films thicker than {approx}22 nm were in a relaxed state because of the strain relaxation mechanism caused by misfit dislocation formation. Clear piezoresponses and polarization reversal phenomena can be observed in the ultrathin limit down to 8 nm through Piezo Force Microscope experiments. The piezoresponse data as a function of thickness correlates with the structural modification of thin films.

  15. Faster qualification of 193-nm resists for 100-nm development using photo cell monitoring

    NASA Astrophysics Data System (ADS)

    Jones, Chris M.; Kallingal, Chidam; Zawadzki, Mary T.; Jeewakhan, Nazneen N.; Kaviani, Nazila N.; Krishnan, Prakash; Klaum, Arthur D.; Van Ess, Joel

    2003-05-01

    The development of 100-nm design rule technologies is currently taking place in many R&D facilities across the world. For some critical alyers, the transition to 193-nm resist technology has been required to meet this leading edge design rule. As with previous technology node transitions, the materials and processes available are undergoing changes and improvements as vendors encounter and solve problems. The initial implementation of the 193-nm resits process did not meet the photolithography requirements of some IC manufacturers due to very high Post Exposure Bake temperature sensitivity and consequently high wafer to wafer CD variation. The photoresist vendors have been working to improve the performance of the 193-nm resists to meet their customer's requirements. Characterization of these new resists needs to be carried out prior to implementation in the R&D line. Initial results on the second-generation resists evaluated at Cypress Semicondcutor showed better CD control compared to the aelrier resist with comparable Depth of Focus (DOF), Exposure Latitute, Etch Resistance, etc. In addition to the standard lithography parameters, resist characterization needs to include defect density studies. It was found that the new resists process with the best CD control, resulted in the introduction of orders of magnitude higher yield limiting defects at Gate, Contact adn Local Interconnect. The defect data were shared with the resists vendor and within days of the discovery the resist vendor was able to pinpoint the source of the problem. The fix was confirmed and the new resists were successfully released to production. By including defect monitoring into the resist qualification process, Cypress Semiconductor was able to 1) drive correction actions earlier resulting in faster ramp and 2) eliminate potential yield loss. We will discuss in this paper how to apply the Micro Photo Cell Monitoring methodology for defect monitoring in the photolithogprhay module and the

  16. EUV reticle inspection with a 193nm reticle inspector

    NASA Astrophysics Data System (ADS)

    Broadbent, William; Inderhees, Gregg; Yamamoto, Tetsuya; Lee, Isaac; Lim, Phillip

    2013-06-01

    The prevailing industry opinion is that EUV Lithography (EUVL) will enter High Volume Manufacturing (HVM) in the 2015 - 2017 timeframe at the 16nm HP node. Every year the industry assesses the key risk factors for introducing EUVL into HVM - blank and reticle defects are among the top items. To reduce EUV blank and reticle defect levels, high sensitivity inspection is needed. To address this EUV inspection need, KLA-Tencor first developed EUV blank inspection and EUV reticle inspection capability for their 193nm wavelength reticle inspection system - the Teron 610 Series (2010). This system has become the industry standard for 22nm / 3xhp optical reticle HVM along with 14nm / 2xhp optical pilot production; it is further widely used for EUV blank and reticle inspection in R and D. To prepare for the upcoming 10nm / 1xhp generation, KLA-Tencor has developed the Teron 630 Series reticle inspection system which includes many technical advances; these advances can be applied to both EUV and optical reticles. The advanced capabilities are described in this paper with application to EUV die-to-database and die-to-die inspection for currently available 14nm / 2xhp generation EUV reticles. As 10nm / 1xhp generation optical and EUV reticles become available later in 2013, the system will be tested to identify areas for further improvement with the goal to be ready for pilot lines in early 2015.

  17. SensorNet Node Suite

    2004-09-01

    The software in the SensorNet Node adopts and builds on IEEE 1451 interface principles to read data from and control sensors, stores the data in internal database structures, and transmits it in adapted Web Feature Services protocol packets to the SensorNet database. Failover software ensures that at least one available mode of communication remains alive.

  18. 469nm Fiber Laser Source

    SciTech Connect

    Drobshoff, A; Dawson, J W; Pennington, D M; Payne, S A; Beach, R

    2005-01-20

    We have demonstrated 466mW of 469nm light from a frequency doubled continuous wave fiber laser. The system consisted of a 938nm single frequency laser diode master oscillator, which was amplified in two stages to 5 Watts using cladding pumped Nd{sup 3+} fiber amplifiers and then frequency doubled in a single pass through periodically poled KTP. The 3cm long PPKTP crystal was made by Raicol Crystals Ltd. with a period of 5.9 {micro}m and had a phase match temperature of 47 degrees Centigrade. The beam was focused to a 1/e{sup 2} diameter in the crystal of 29 {micro}m. Overall conversion efficiency was 11% and the results agreed well with standard models. Our 938nm fiber amplifier design minimizes amplified spontaneous emission at 1088nm by employing an optimized core to cladding size ratio. This design allows the 3-level transition to operate at high inversion, thus making it competitive with the 1088nm 4-level transition. We have also carefully chosen the fiber coil diameter to help suppress propagation of wavelengths longer than 938 nm. At 2 Watts, the 938nm laser had an M{sup 2} of 1.1 and good polarization (correctable with a quarter and half wave plate to >10:1).

  19. Mask patterning for the 22nm node using a proton multi-beam projection pattern generator

    NASA Astrophysics Data System (ADS)

    Butschke, Joerg; Irmscher, Mathias; Sailer, Holger; Nedelmann, Lorenz; Pritschow, Marcus; Loeschner, Hans; Platzgummer, Elmar

    2008-10-01

    Decreasing throughput of high-end pattern generators and insufficient line edge roughness (LER) of chemically amplified resists (CAR) might become limitations for future mask making. An alternative could be the introduction of less sensitive resists, linked to a turning away from today's electron beam pattern generators. Moderate exposure doses of around 25μC/cm2 could be achieved for non-CAR materials like HSQ by the use of 10keV protons. Targeting optimized absorber performance, Shin-Etsu has developed an Opaque-molybdenum-over-glass (OMOG) material, designed for 32mn mask technology and beyond. This hard mask concept allows using thin resist layers, as required by an ion beam exposure. Goal of this work was to assess a HSQ based non-CAR process using a multiple ion beam pattern generator including subsequent transfer into the absorber by dry etch processes. Proton exposures have been done on the IMS Nanofabrication proof of concept tool which is designed for 40,000 programmable ion beams. For comparison, an electron based reference process has been set up in parallel to the proton multi-beam approach. Hard mask opening and subsequent absorber etching have been accomplished in a state of the art mask etcher. Assessment of the process flow has been done in terms of feature profile, LER and resolution capability.

  20. Detectability and printability of EUVL mask blank defects for the32 nm HP node

    SciTech Connect

    Cho, Wonil; Han, Hak-Seung; Goldberg, Kenneth A.; Kearney,Patrick A.; Jeon, Chan-Uk

    2007-08-01

    The readiness of a defect-free extreme ultraviolet lithography (EUVL) mask blank infrastructure is one of the main enablers for the insertion of EUVL technology into production. It is essential to have sufficient defect detection capability and understanding of defect printability to develop a defect-free EUVL mask blank infrastructure. The SEMATECH Mask Blank Development Center (MBDC) has been developing EUVL mask blanks with low defect densities with the Lasertec M1350 and M7360, the 1st and 2nd generations, respectively, of visible light EUVL mask blank inspection tools. Although the M7360 represents a significant improvement in our defect detection capability, it is time to start developing a 3rd generation tool for EUVL mask blank inspection. The goal of this tool is to detect all printable defects; therefore, understanding defect printability criteria is critical to this tool development. In this paper, we will investigate the defect detectability of a 2nd generation blank inspection tool and a patterned EUVL mask inspection tool. We will also compare the ability of the inspection tools to detect programmed defects whose printability has been estimated from wafer printing results and actinic aerial images results.

  1. Planar Fully-Depleted-Silicon-On-Insulator technologies: Toward the 28 nm node and beyond

    NASA Astrophysics Data System (ADS)

    Doris, B.; DeSalvo, B.; Cheng, K.; Morin, P.; Vinet, M.

    2016-03-01

    This paper presents a comprehensive overview of the research done in the last decade on planar Fully-Depleted-Silicon-On-Insulator (FDSOI) technologies in the frame of the joint development program between IBM, ST Microelectronics and CEA-LETI. In particular, we review the technological developments ranging from substrate engineering to process modules that enable functionality and improve FDSOI performance over several generations. Various multi Vt integration schemes to maximize the benefits of the thin BOX FDSOI platform are discussed. Manufacturability as well as scalability concerns are highlighted and addressed. In addition, this work provides understanding of the performance/power trade-offs for FDSOI circuits and device variability. Finally, clear directions for future application-specific products are given, demonstrating that FDSOI is an attractive CMOS option for next generation high performance and low-power applications.

  2. Optimum ArFi laser bandwidth for 10nm node logic imaging performance

    NASA Astrophysics Data System (ADS)

    Alagna, Paolo; Zurita, Omar; Timoshkov, Vadim; Wong, Patrick; Rechtsteiner, Gregory; Baselmans, Jan; Mailfert, Julien

    2015-03-01

    Lithography process window (PW) and CD uniformity (CDU) requirements are being challenged with scaling across all device types. Aggressive PW and yield specifications put tight requirements on scanner performance, especially on focus budgets resulting in complicated systems for focus control. In this study, an imec N10 Logic-type test vehicle was used to investigate the E95 bandwidth impact on six different Metal 1 Logic features. The imaging metrics that track the impact of light source E95 bandwidth on performance of hot spots are: process window (PW), line width roughness (LWR), and local critical dimension uniformity (LCDU). In the first section of this study, the impact of increasing E95 bandwidth was investigated to observe the lithographic process control response of the specified logic features. In the second section, a preliminary assessment of the impact of lower E95 bandwidth was performed. The impact of lower E95 bandwidth on local intensity variability was monitored through the CDU of line end features and the LWR power spectral density (PSD) of line/space patterns. The investigation found that the imec N10 test vehicle (with OPC optimized for standard E95 bandwidth of300fm) features exposed at 200fm showed pattern specific responses, suggesting areas of potential interest for further investigation.

  3. Decellularized Lymph Nodes as Scaffolds for Tissue Engineered Lymph Nodes

    PubMed Central

    Cuzzone, Daniel A.; Albano, Nicholas J.; Aschen, Seth Z.; Ghanta, Swapna

    2015-01-01

    Abstract Background: The lymphatic system is commonly injured during cancer treatment. However, despite the morbidity of these injuries, there are currently no options for replacing damaged lymphatics. The purpose of this study was to optimize methods for decellularization of murine lymph nodes (LN) and to determine if these scaffolds can be used to tissue engineer lymph node-like structures. Methods and Results: LNs were harvested from adult mice and subjected to various decellularization protocols. The degree of decellularization and removal of nuclear material was analyzed histologically and quantitatively using DNA isolation. In addition, we analyzed histological architecture by staining for matrix proteins. After the optimal method of decellularization was identified, decellularized constructs were implanted in the renal capsule of syngeneic or allogeneic recipient mice and analyzed for antigenicity. Finally, to determine if decellularized constructs could deliver lymphocytes to recipient animals, the matrices were repopulated with splenocytes, implanted in submuscular pockets, and harvested 14 days later. Decellularization was best accomplished with the detergent sodium dodecyl sulfate (SDS), resulting in negligible residual cellular material but maintenance of LN architecture. Implantation of decellularized LNs into syngeneic or allogeneic mice did not elicit a significant antigenic response. In addition, repopulation of decellularized LNs with splenocytes resulted in successful in vivo cellular delivery. Conclusions: We show, for the first time, that LNs can be successfully decellularized and that these matrices have preserved extracellular matrix architecture and the potential to deliver leukocytes in vivo. Future studies are needed to determine if tissue engineered lymph nodes maintain immunologic function. PMID:25144673

  4. Lymph node staging in prostate cancer.

    PubMed

    Sankineni, Sandeep; Brown, Anna M; Fascelli, Michele; Law, Yan Mee; Pinto, Peter A; Choyke, Peter L; Turkbey, Baris

    2015-05-01

    Nodal staging is important in prostate cancer treatment. While surgical lymph node dissection is the classic method of determining whether lymph nodes harbor malignancy, this is a very invasive technique. Current noninvasive approaches to identifying malignant lymph nodes are limited. Conventional imaging methods rely on size and morphology of lymph nodes and have notoriously low sensitivity for detecting malignant nodes. New imaging techniques such as targeted positron emission tomography (PET) imaging and magnetic resonance lymphography (MRL) with iron oxide particles are promising for nodal staging of prostate cancer. In this review, the strengths and limitations of imaging techniques for lymph node staging of prostate cancer are discussed.

  5. Identifying node importance in complex networks

    NASA Astrophysics Data System (ADS)

    Hu, Ping; Fan, Wenli; Mei, Shengwei

    2015-07-01

    In this paper, we propose a novel node importance evaluation method from the perspective of the existence of mutual dependence among nodes. The node importance comprises its initial importance and the importance contributions from both the adjacent and non-adjacent nodes according to the dependence strength between them. From the simulation analyses on an example network and the ARPA network, we observe that our method can well identify the node importance. Then, the cascading failures on the Netscience and E-mail networks demonstrate that the networks are more vulnerable when continuously removing the important nodes identified by our method, which further proves the accuracy of our method.

  6. Controlling data transfers from an origin compute node to a target compute node

    DOEpatents

    Archer, Charles J.; Blocksome, Michael A.; Ratterman, Joseph D.; Smith, Brian E.

    2011-06-21

    Methods, apparatus, and products are disclosed for controlling data transfers from an origin compute node to a target compute node that include: receiving, by an application messaging module on the target compute node, an indication of a data transfer from an origin compute node to the target compute node; and administering, by the application messaging module on the target compute node, the data transfer using one or more messaging primitives of a system messaging module in dependence upon the indication.

  7. 32 nm imprint masks using variable shape beam pattern generators

    NASA Astrophysics Data System (ADS)

    Selinidis, Kosta; Thompson, Ecron; Schmid, Gerard; Stacey, Nick; Perez, Joseph; Maltabes, John; Resnick, Douglas J.; Yeo, Jeongho; Kim, Hoyeon; Eynon, Ben

    2008-05-01

    Imprint lithography has been included on the ITRS Lithography Roadmap at the 32, 22 and 16 nm nodes. Step and Flash Imprint Lithography (S-FIL ®) is a unique method that has been designed from the beginning to enable precise overlay for creating multilevel devices. A photocurable low viscosity monomer is dispensed dropwise to meet the pattern density requirements of the device, thus enabling imprint patterning with a uniform residual layer across a field and across entire wafers. Further, S-FIL provides sub-100 nm feature resolution without the significant expense of multi-element, high quality projection optics or advanced illumination sources. However, since the technology is 1X, it is critical to address the infrastructure associated with the fabrication of templates. For sub-32 nm device manufacturing, one of the major technical challenges remains the fabrication of full-field 1x templates with commercially viable write times. Recent progress in the writing of sub-40 nm patterns using commercial variable shape e-beam tools and non-chemically amplified resists has demonstrated a very promising route to realizing these objectives, and in doing so, has considerably strengthened imprint lithography as a competitive manufacturing technology for the sub 32nm node. Here we report the first imprinting results from sub-40 nm full-field patterns, using Samsung's current flash memory production device design. The fabrication of the template is discussed and the resulting critical dimension control and uniformity are discussed, along with image placement results. The imprinting results are described in terms of CD uniformity, etch results, and overlay.

  8. Full-field imprinting of sub-40 nm patterns

    NASA Astrophysics Data System (ADS)

    Yeo, Jeongho; Kim, Hoyeon; Eynon, Ben

    2008-03-01

    Imprint lithography has been included on the ITRS Lithography Roadmap at the 32, 22 and 16 nm nodes. Step and Flash Imprint Lithography (S-FIL (R)) is a unique patterning method that has been designed from the beginning to enable precise overlay to enable multilevel device fabrication. A photocurable low viscosity resist is dispensed dropwise to match the pattern density requirements of the device, thus enabling patterning with a uniform residual layer thickness across a field and across multiple wafers. Further, S-FIL provides sub-50 nm feature resolution without the significant expense of multi-element projection optics or advanced illumination sources. However, since the technology is 1X, it is critical to address the infrastructure associated with the fabrication of imprint masks (templates). For sub-32 nm device manufacturing, one of the major technical challenges remains the fabrication of full-field 1x imprint masks with commercially viable write times. Recent progress in the writing of sub-40 nm patterns using commercial variable shape e-beam tools and non-chemically amplified resists has demonstrated a very promising route to realizing these objectives, and in doing so, has considerably strengthened imprint lithography as a competitive manufacturing technology for the sub-32nm node. Here we report the first imprinting results from sub-40 nm full-field patterns, using Samsung's current flash memory production device design. The fabrication of the imprint mask and the resulting critical dimension control and uniformity are discussed, along with image placement results. The imprinting results are described in terms of CD uniformity, etch results, and overlay.

  9. Flow Simulation of N3-X Hybrid Wing-Body Configuration

    NASA Technical Reports Server (NTRS)

    Kim, Hyoungjin; Liou, Meng-Sing

    2013-01-01

    System studies show that a N3-X hybrid wing-body aircraft with a turboelectric distributed propulsion system using a mail-slot inlet/nozzle nacelle can meet the environmental and performance goals for N+3 generation transports (three generations beyond the current air transport technology level) set by NASA s Subsonic Fixed Wing Project. In this study, a Navier-Stokes flow simulation of N3-X on hybrid unstructured meshes was conducted, including the mail-slot propulsor. The geometry of the mail-slot propulsor was generated by a CAD (Computer-Aided Design)-free shape parameterization. A body force approach was used for a more realistic and efficient simulation of the turning and loss effects of the fan blades and the inlet-fan interactions. Flow simulation results of the N3-X demonstrates the validity of the present approach.

  10. Resource-Efficient High-Yield Ionothermal Synthesis of Microcrystalline Cu3-xP.

    PubMed

    Wolff, Alexander; Pallmann, Julia; Boucher, Richard; Weiz, Alexander; Brunner, Eike; Doert, Thomas; Ruck, Michael

    2016-09-01

    Polycrystalline Cu3-xP was successfully synthesized in different ionic liquids comprising imidazolium and phosphonium cations. The reaction of elemental copper and red phosphorus in trihexyltetradecylphosphonium chloride at 200 °C led to single-phase Cu3-xP (x = 0.05) within 24 h with a quantitative yield (99%). Liquid-state nuclear magnetic resonance spectroscopy of the ionic liquids revealed degeneration of the imidazolium cations under the synthesis conditions, while phosphonium cations remain stable. The solid products were characterized with X-ray powder diffraction, scanning electron microscopy, energy-dispersive X-ray spectroscopy, solid-state nuclear magnetic resonance spectroscopy, and elemental analysis. A reinvestigation of the electronic transport properties of Cu2.95(4)P showed metallic behavior for the bulk material. The formation of CuP2 during the synthesis of phosphorus-rich Cu3-xP (x ≥ 0.1) was observed. PMID:27559933

  11. A Noise and Emissions Assessment of the N3-X Transport

    NASA Technical Reports Server (NTRS)

    Berton, Jeffrey J.; Haller, William J.

    2014-01-01

    Analytical predictions of certification noise and exhaust emissions for NASA's N3-X - a notional, hybrid wingbody airplane - are presented in this paper. The N3-X is a 300-passenger concept transport propelled by an array of fans distributed spanwise near the trailing edge of the wingbody. These fans are driven by electric motors deriving power from twin generators driven by turboshaft engines. Turboelectric distributed hybrid propulsion has the potential to dramatically increase the propulsive efficiency of aircraft. The noise and exhaust emission estimates presented here are generated using NASA's conceptual design systems analysis tools with several key modifications to accommodate this unconventional architecture. These tools predict certification noise and the emissions of oxides of nitrogen by leveraging data generated from a recent analysis of the N3-X propulsion system.

  12. APRIL.MOD3X - An interactive computer simulator of severe accidents in BWRs

    SciTech Connect

    Podowski, M.Z.; Kurul, N.; Lahey, R.T. Jr.; Burger, J.M.

    1996-12-31

    APRIL is a fast-running and user-friendly system code for interactive simulations of severe accidents in boiling water reactors (BWRs). The component models in the most recent version, APRIL.MOD3X, include the reactor core and pressure vessel, as well as the primary and secondary containments. Whereas APRIL.MOD3X is a fast-running code, the models are mechanistically based and account for several important local phenomena affecting accident progression. The code has been extensively validated against experimental data. The code can be run either in a stand-alone fashion or in conjunction with its graphical user interface (GUI). APRIL.MOD3X is intended for use in developing improved accident management strategies in support of emergency preparedness procedures and in assessment of the consequences of postulated accident scenarios.

  13. Cholinotrophic basal forebrain system alterations in 3xTg-AD transgenic mice.

    PubMed

    Perez, Sylvia E; He, Bin; Muhammad, Nadeem; Oh, Kwang-Jin; Fahnestock, Margaret; Ikonomovic, Milos D; Mufson, Elliott J

    2011-02-01

    The cholinotrophic system, which is dependent upon nerve growth factor and its receptors for survival, is selectively vulnerable in Alzheimer's disease (AD). But, virtually nothing is known about how this deficit develops in relation to the hallmark lesions of this disease, amyloid plaques and tau containing neurofibrillary tangles. The vast majority of transgenic models of AD used to evaluate the effect of beta amyloid (Aβ) deposition upon the cholinotrophic system over-express the amyloid precursor protein (APP). However, nothing is known about how this system is affected in triple transgenic (3xTg)-AD mice, an AD animal model displaying Aβ plaque- and tangle-like pathology in the cortex and hippocampus, which receive extensive cholinergic innervation. We performed a detailed morphological and biochemical characterization of the cholinotrophic system in young (2-4 months), middle-aged (13-15 months) and old (18-20 months) 3xTg-AD mice. Cholinergic neuritic swellings increased in number and size with age, and were more conspicuous in the hippocampal-subicular complex in aged female than in 3xTg-AD male mice. Stereological analysis revealed a reduction in choline acetyltransferase (ChAT) positive cells in the medial septum/vertical limb of the diagonal band of Broca in aged 3xTg-AD mice. ChAT enzyme activity levels decreased significantly in the hippocampus of middle-aged 3xTg-AD mice compared to age-matched non-transgenic (or wild type) mice. ProNGF protein levels increased in the cortex of aged 3xTg-AD mice, whereas TrkA protein levels were reduced in a gender-dependent manner in aged mutant mice. In contrast, p75(NTR) protein cortical levels were stable but increased in the hippocampus of aged 3xTg-AD mice. These data demonstrate that cholinotrophic alterations in 3xTg-AD mice are age- and gender-dependent and more pronounced in the hippocampus, a structure more severely affected by Aβ plaque pathology. PMID:20937383

  14. Sinus Node and Atrial Arrhythmias.

    PubMed

    John, Roy M; Kumar, Saurabh

    2016-05-10

    Although sinus node dysfunction (SND) and atrial arrhythmias frequently coexist and interact, the putative mechanism linking the 2 remain unclear. Although SND is accompanied by atrial myocardial structural changes in the right atrium, atrial fibrillation (AF) is a disease of variable interactions between left atrial triggers and substrate most commonly of left atrial origin. Significant advances have been made in our understanding of the genetic and pathophysiologic mechanism underlying the development and progression of SND and AF. Although some patients manifest SND as a result of electric remodeling induced by periods of AF, others develop progressive atrial structural remodeling that gives rise to both conditions together. The treatment strategy will thus vary according to the predominant disease phenotype. Although catheter ablation will benefit patients with predominantly AF and secondary SND, cardiac pacing may be the mainstay of therapy for patients with predominant fibrotic atrial cardiomyopathy. This contemporary review summarizes current knowledge on sinus node pathophysiology with the broader goal of yielding insights into the complex relationship between sinus node disease and atrial arrhythmias.

  15. Underwater Sensor Nodes and Networks

    PubMed Central

    Lloret, Jaime

    2013-01-01

    Sensor technology has matured enough to be used in any type of environment. The appearance of new physical sensors has increased the range of environmental parameters for gathering data. Because of the huge amount of unexploited resources in the ocean environment, there is a need of new research in the field of sensors and sensor networks. This special issue is focused on collecting recent advances on underwater sensors and underwater sensor networks in order to measure, monitor, surveillance of and control of underwater environments. On the one hand, from the sensor node perspective, we will see works related with the deployment of physical sensors, development of sensor nodes and transceivers for sensor nodes, sensor measurement analysis and several issues such as layer 1 and 2 protocols for underwater communication and sensor localization and positioning systems. On the other hand, from the sensor network perspective, we will see several architectures and protocols for underwater environments and analysis concerning sensor network measurements. Both sides will provide us a complete view of last scientific advances in this research field. PMID:24013489

  16. [Extracorporeal shockwave lithotripsy and lymph node calcification].

    PubMed

    Higashihara, E; Fujime, M; Niijima, T

    1987-05-01

    A female patient with calculi in the left kidney and calcified lymph nodes in the vicinity of the left renal pelvis was treated successfully with extracorporeal shock wave lithotripsy. The simultaneous action of the shock waves on the calcified lymph nodes did not cause any alteration of the lymph node structure. Thus a shock-wave treatment can be carried out even in the presence of a calcified lymph node without complications.

  17. T.Node, industrial version of supernode

    NASA Astrophysics Data System (ADS)

    Flieller, Sylvain

    1989-12-01

    The Esprit I P1085 "SuperNode" project developed a modular reconfigurable archtecture, based on transputers. This highly parallel machine is now marketed by Telmat Informatique under the name T.Node. This paper presents the P1085 project, the architecture of SuperNode, its industrial implementation and its software enviroment.

  18. Axillary lymph node analysis using Raman spectroscopy

    NASA Astrophysics Data System (ADS)

    Smith, Jenny; Christie-Brown, Jonathan; Sammon, Alastair; Stone, Nicholas

    2004-07-01

    Raman Spectroscopy is an optical diagnostic technique applied in this study to classify axillary lymph nodes from breast cancer patients as positive or negative for metastases. The mapping technique in this study is 81% sensitive and 97% specific for the correct classification of positive lymph nodes. Raman spectral images of lymph node sections are constructed to facilitate interpretation of tissue features.

  19. Master formula approach to broken chiral U(3)xU(3) symmetry

    SciTech Connect

    Hiroyuki Kamano

    2010-04-01

    The master formula approach to chiral symmetry breaking proposed by Yamagishi and Zahed is extended to the U_R(3)xU_L(3) group, in which effects of the U_A(1) anomaly and the flavor symmetry breaking m_u \

  20. Ultrasmall Biocompatible WO3- x Nanodots for Multi-Modality Imaging and Combined Therapy of Cancers.

    PubMed

    Wen, Ling; Chen, Ling; Zheng, Shimin; Zeng, Jianfeng; Duan, Guangxin; Wang, Yong; Wang, Guanglin; Chai, Zhifang; Li, Zhen; Gao, Mingyuan

    2016-07-01

    Ultrasmall biocompatible WO3 - x nanodots with an outstanding X-ray radiation sensitization effect are prepared, and demonstrated to be applicable for multi-modality tumor imaging through computed tomography and photoacoustic imaging (PAI), and effective cancer treatment combining both photothermal therapy and radiation therapy.

  1. Impairment of nesting behaviour in 3xTg-AD mice.

    PubMed

    Torres-Lista, Virginia; Giménez-Llort, Lydia

    2013-06-15

    Deterioration in executive functions and daily life activities (DLA) are early signs of Alzheimer's disease (AD) that signal the need for caregiver attention. We have addressed this issue in the 3xTg-AD mice model for AD and studied nesting behaviour as a natural DLA of parental structures as well as at early- (6 month-old) and advanced-stages (12 month-old) of the disease in isolated animals. The results show genetic, gender and age-dependent impairment of nesting behaviour but also aware about the relevance of factors such as the temporal course of nest construction and the nesting material. Paper towel consistently showed the impairment of nesting behavior in 3xTg-AD mice since early stages of the disease and in both social conditions. Their nest construction was slow temporal pattern and of poor quality, especially in females and advanced stages of the disease where the deficits were shown from the first day. In all cases, cotton elicited an intense behaviour that lead to perfect nesting during the first 48 h. Genotype, gender and age differences were found in the onset of nesting behaviour, with a time delay in the 3xTg-AD mice, particularly in females. The reported impairment of nesting behaviour in 3xTg-AD provides another behavioral tool to assess the benefits of preventive and/or therapeutic strategies, as well as the potential action of risk factors of AD, in this animal model. PMID:23523959

  2. Window type: paired 3x2 multipaned steel window flanked by 1x3 ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    Window type: paired 3x2 multipaned steel window flanked by 1x3 multipaned steel casements, breaking building corner. Broad overhanging eave also illustrated. Second story detail. Building 13, facing east - Harbor Hills Housing Project, 26607 Western Avenue, Lomita, Los Angeles County, CA

  3. Comparison of Yamax pedometer and GT3X accelerometer steps in a free-living sample

    Technology Transfer Automated Retrieval System (TEKTRAN)

    Our objective was to compare steps detected by the Yamax pedometer (PEDO) versus the GT3X accelerometer (ACCEL) in free-living adults. Daily PEDO and ACCEL steps were collected from a sample of 23 overweight and obese participants (18 females; mean +/- sd: age = 52.6 +/- 8.4 yr.; body mass index = 3...

  4. The effect of oleic acid on the synthesis of Fe(3-x)O4 nanoparticles over a wide size range.

    PubMed

    Moya, Carlos; Batlle, Xavier; Labarta, Amílcar

    2015-11-01

    This work reports on the effect of the oleic acid concentration on the magnetic and structural properties of Fe3-xO4 nanoparticles synthesized by thermal decomposition of Fe(acac)3 in benzyl-ether. This method allows the synthesis of highly monodisperse particles ranging from 7 to 100 nm in size by only varying the concentration of oleic acid in the reaction mixture. The structural and magnetic characterization reveal homogeneous particles in composition, with narrow particle size distribution, which are single-phase magnetite with almost bulk-like values of the saturation magnetization of about 90-99 emu g(-1) at low temperatures and show the characteristic anomaly in the zero field-cooling magnetization curves associated with the Verwey transition for nanoparticles bigger than about 7 nm. In addition, the analyses of aliquots of the reaction mixtures by Fourier transform infrared spectroscopy at various stages shed light on the nucleation and growth processes of the particles.

  5. Approach to intensely enhancing neck nodes

    PubMed Central

    Karandikar, Amit; Gummalla, Krishna Mohan; Loke, Siu Cheng; Goh, Julian; Tan, Tiong Yong

    2016-01-01

    Cervical node evaluation is one of the most common problems encountered by a radiologist. Here, we present a pictorial review of intensely enhancing neck nodes. While enhancement in a cervical node is a common radiologic finding on contrast-enhanced computed tomography scan, only few conditions cause intense enhancement in cervical nodes. We discuss the common causes of intensely enhancing neck nodes along with pertinent radiologic features and key differentiating points that aid radiologists in reaching a diagnosis. In addition, we discuss certain potential non-nodal mimics, which need to be excluded. PMID:26782154

  6. Untraceable Mobile Node Authentication in WSN

    PubMed Central

    Han, Kyusuk; Kim, Kwangjo; Shon, Taeshik

    2010-01-01

    Mobility of sensor node in Wireless Sensor Networks (WSN) brings security issues such as re-authentication and tracing the node movement. However, current security researches on WSN are insufficient to support such environments since their designs only considered the static environments. In this paper, we propose the efficient node authentication and key exchange protocol that reduces the overhead in node re-authentication and also provides untraceability of mobile nodes. Compared with previous protocols, our protocol has only a third of communication and computational overhead. We expect our protocol to be the efficient solution that increases the lifetime of sensor network. PMID:22399886

  7. Black sentinel lymph node and 'scary stickers'.

    PubMed

    Yang, Arthur S; Creagh, Terrence A

    2013-04-01

    An unusual case is presented of a young adult patient with two black-stained, radio-nucleotide tracer-active sentinel lymph nodes biopsied following her primary cutaneous melanoma treatment. This was subsequently confirmed to be secondary to cutaneous tattoos, averting the need of an elective regional node dissection. History of tattooing and tattoo removal should therefore be obtained as a routine in all melanoma patients considered for sentinel node biopsy (SLN). SLN biopsy and any subsequent completion node dissection should be strictly staged so that proper histologic diagnosis of the sentinel node is available for correct decision making and treatment. PMID:23010587

  8. Inverse lithography technique for advanced CMOS nodes

    NASA Astrophysics Data System (ADS)

    Villaret, Alexandre; Tritchkov, Alexander; Entradas, Jorge; Yesilada, Emek

    2013-04-01

    Resolution Enhancement Techniques have continuously improved over the last decade, driven by the ever growing constraints of lithography process. Despite the large number of RET applied, some hotspot configurations remain challenging for advanced nodes due to aggressive design rules. Inverse Lithography Technique (ILT) is evaluated here as a substitute to the dense OPC baseline. Indeed ILT has been known for several years for its near-to-ideal mask quality, while also being potentially more time consuming in terms of OPC run and mask processing. We chose to evaluate Mentor Graphics' ILT engine "pxOPCTM" on both lines and via hotspot configurations. These hotspots were extracted from real 28nm test cases where the dense OPC solution is not satisfactory. For both layer types, the reference OPC consists of a dense OPC engine coupled to rule-based and/or model-based assist generation method. The same CM1 model is used for the reference and the ILT OPC. ILT quality improvement is presented through Optical Rule Check (ORC) results with various adequate detectors. Several mask manufacturing rule constraints (MRC) are considered for the ILT solution and their impact on process ability is checked after mask processing. A hybrid OPC approach allowing localized ILT usage is presented in order to optimize both quality and runtime. A real mask is prepared and fabricated with this method. Finally, results analyzed on silicon are presented to compare localized ILT to reference dense OPC.

  9. Transformation of Sintered CsPbBr3 Nanocrystals to Cubic CsPbI3 and Gradient CsPbBrxI3-x through Halide Exchange.

    PubMed

    Hoffman, Jacob B; Schleper, A Lennart; Kamat, Prashant V

    2016-07-13

    All-inorganic cesium lead halide (CsPbX3, X = Br(-), I(-)) perovskites could potentially provide comparable photovoltaic performance with enhanced stability compared to organic-inorganic lead halide species. However, small-bandgap cubic CsPbI3 has been difficult to study due to challenges forming CsPbI3 in the cubic phase. Here, a low-temperature procedure to form cubic CsPbI3 has been developed through a halide exchange reaction using films of sintered CsPbBr3 nanocrystals. The reaction was found to be strongly dependent upon temperature, featuring an Arrhenius relationship. Additionally, film thickness played a significant role in determining internal film structure at intermediate reaction times. Thin films (50 nm) showed only a small distribution of CsPbBrxI3-x species, while thicker films (350 nm) exhibited much broader distributions. Furthermore, internal film structure was ordered, featuring a compositional gradient within film. Transient absorption spectroscopy showed the influence of halide exchange on the excited state of the material. In thicker films, charge carriers were rapidly transferred to iodide-rich regions near the film surface within the first several picoseconds after excitation. This ultrafast vectorial charge-transfer process illustrates the potential of utilizing compositional gradients to direct charge flow in perovskite-based photovoltaics. PMID:27322132

  10. Node assignment in heterogeneous computing

    NASA Technical Reports Server (NTRS)

    Som, Sukhamoy

    1993-01-01

    A number of node assignment schemes, both static and dynamic, are explored for the Algorithm to Architecture Mapping Model (ATAMM). The architecture under consideration consists of heterogeneous processors and implements dataflow models of real-time applications. Terminology is developed for heterogeneous computing. New definitions are added to the ATAMM for token and assignment classifications. It is proved that a periodic execution is possible for dataflow graphs. Assignment algorithms are developed and proved. A design procedure is described for satisfying an objective function in an heterogeneous architecture. Several examples are provided for illustration.

  11. Dedicated heterogeneous node scheduling including backfill scheduling

    DOEpatents

    Wood, Robert R.; Eckert, Philip D.; Hommes, Gregg

    2006-07-25

    A method and system for job backfill scheduling dedicated heterogeneous nodes in a multi-node computing environment. Heterogeneous nodes are grouped into homogeneous node sub-pools. For each sub-pool, a free node schedule (FNS) is created so that the number of to chart the free nodes over time. For each prioritized job, using the FNS of sub-pools having nodes useable by a particular job, to determine the earliest time range (ETR) capable of running the job. Once determined for a particular job, scheduling the job to run in that ETR. If the ETR determined for a lower priority job (LPJ) has a start time earlier than a higher priority job (HPJ), then the LPJ is scheduled in that ETR if it would not disturb the anticipated start times of any HPJ previously scheduled for a future time. Thus, efficient utilization and throughput of such computing environments may be increased by utilizing resources otherwise remaining idle.

  12. Photoionization of Nitromethane at 355nm and 266nm

    NASA Astrophysics Data System (ADS)

    Martínez, Denhi; Betancourt, Francisco; Poveda, Juan Carlos; Guerrero, Alfonso; Cisneros, Carmen; Álvarez, Ignacio

    2014-05-01

    Nitromethane is one of the high-yield clean liquid fuels, i.e., thanks to the oxygen contained in nitromethane, much less atmospheric oxygen is burned compared to hydrocarbons such as gasoline, making the nitromethane an important prototypical energetic material, the understanding of its chemistry is relevant in other fields such as atmospheric chemistry or biochemistry. In this work we present the study of photoionization dynamics by multiphoton absorption with 355 nm and 266 nm wavelength photons, using time of flight spectrometry in reflectron mode (R-TOF). Some of the observed ion products appear for both wavelength and other only in one of them; both results were compared with preview observations and new ions were detected. This work is supported by CONACYT grant 165410 and DGAPA-UNAM grants IN-107-912 and IN-102-613.

  13. Structural characterization and magnetic properties of sol-gel derived ZnxFe3-xO4 nanoparticles

    NASA Astrophysics Data System (ADS)

    Petrova, E.; Kotsikau, D.; Pankov, V.

    2015-03-01

    Nanocrystalline ZnxFe3-xO4 solid solutions (with x=0, 0.18, 0.45, 1) with crystallite sizes of 5-10 nm, specific surface of about 180 m2/g were synthesized via an inorganic variant of the sol-gel approach. The composition and structure of the formed nanoparticles were examined with the help of powder X-ray diffraction, scanning electron microscopy, transmission electron microscopy, inductively coupled plasma atomic emission spectrometry and Fourier transform infrared spectroscopy. Hysteresis loops recorded for the samples indicate their ferromagnetic behavior at 5 K and superparamagnetic behavior at 300 K. The highest maximum magnetization of 59 emu/g at room temperature corresponds to Zn0.18Fe2.82O4 composition, and at 5 K to Zn0.45Fe2.55O4 (86 emu/g). The saturation magnetization of the pure magnetite was measured to be respectively 62 and 49 emu/g.

  14. Implementation of reflected light die-to-die inspection and ReviewSmart to improve 65nm DRAM mask fabrication

    NASA Astrophysics Data System (ADS)

    Kim, Do Young; Cho, Won Il; Park, Jin Hyung; Chung, Dong Hoon; Cha, Byung Chul; Choi, Seong Woon; Han, Woo Sung; Park, Ki Hun; Kim, Nam Wook; Hess, Carl; Ma, Weimin; Kim, David

    2005-11-01

    As the design rule continues to shrink towards 65nm size and beyond the defect criteria are becoming ever more challenging. Pattern fidelity and reticle defects that were once considered as insignificant or nuisance are now becoming significant yield impacting defects. The intent of this study is to utilize the new generation DUV system to compare Die-to-Die Reflected Light inspection and Die-to-Die Transmitted Light Inspection to increase defect detection for optimization of the 65nm node process. In addition, the ReviewSmart will be implemented to help categorically identify systematic tool and process variations and thus allowing user to expedite the learning process to develop a production worthy 65nm node mask process. The learning will be applied to Samsung's pattern inspection strategy, complementing Transmitted Light Inspection, on critical layers of 65 nm node to gain ability to find defects that adversely affect process window.

  15. A dual-modal magnetic nanoparticle probe for preoperative and intraoperative mapping of sentinel lymph nodes by magnetic resonance and near infrared fluorescence imaging.

    PubMed

    Zhou, Zhengyang; Chen, Hongwei; Lipowska, Malgorzata; Wang, Liya; Yu, Qiqi; Yang, Xiaofeng; Tiwari, Diana; Yang, Lily; Mao, Hui

    2013-07-01

    The ability to reliably detect sentinel lymph nodes for sentinel lymph node biopsy and lymphadenectomy is important in clinical management of patients with metastatic cancers. However, the traditional sentinel lymph node mapping with visible dyes is limited by the penetration depth of light and fast clearance of the dyes. On the other hand, sentinel lymph node mapping with radionucleotide technique has intrinsically low spatial resolution and does not provide anatomic details in the sentinel lymph node mapping procedure. This work reports the development of a dual modality imaging probe with magnetic resonance and near infrared imaging capabilities for sentinel lymph node mapping using magnetic iron oxide nanoparticles (10 nm core size) conjugated with a near infrared molecule with emission at 830 nm. Accumulation of magnetic iron oxide nanoparticles in sentinel lymph nodes leads to strong T2 weighted magnetic resonance imaging contrast that can be potentially used for preoperative localization of sentinel lymph nodes, while conjugated near infrared molecules provide optical imaging tracking of lymph nodes with a high signal to background ratio. The new magnetic nanoparticle based dual imaging probe exhibits a significant longer lymph node retention time. Near infrared signals from nanoparticle conjugated near infrared dyes last up to 60 min in sentinel lymph node compared to that of 25 min for the free near infrared dyes in a mouse model. Furthermore, axillary lymph nodes, in addition to sentinel lymph nodes, can be also visualized with this probe, given its slow clearance and sufficient sensitivity. Therefore, this new dual modality imaging probe with the tissue penetration and sensitive detection of sentinel lymph nodes can be applied for preoperative survey of lymph nodes with magnetic resonance imaging and allows intraoperative sentinel lymph node mapping using near infrared optical devices.

  16. A dual-modal magnetic nanoparticle probe for preoperative and intraoperative mapping of sentinel lymph nodes by magnetic resonance and near infrared fluorescence imaging

    PubMed Central

    Zhou, Zhengyang; Chen, Hongwei; Lipowska, Malgorzata; Wang, Liya; Yu, Qiqi; Yang, Xiaofeng; Tiwari, Diana; Yang, Lily; Mao, Hui

    2016-01-01

    The ability to reliably detect sentinel lymph nodes for sentinel lymph node biopsy and lymphadenectomy is important in clinical management of patients with metastatic cancers. However, the traditional sentinel lymph node mapping with visible dyes is limited by the penetration depth of light and fast clearance of the dyes. On the other hand, sentinel lymph node mapping with radionucleotide technique has intrinsically low spatial resolution and does not provide anatomic details in the sentinel lymph node mapping procedure. This work reports the development of a dual modality imaging probe with magnetic resonance and near infrared imaging capabilities for sentinel lymph node mapping using magnetic iron oxide nanoparticles (10 nm core size) conjugated with a near infrared molecule with emission at 830 nm. Accumulation of magnetic iron oxide nanoparticles in sentinel lymph nodes leads to strong T2 weighted magnetic resonance imaging contrast that can be potentially used for preoperative localization of sentinel lymph nodes, while conjugated near infrared molecules provide optical imaging tracking of lymph nodes with a high signal to background ratio. The new magnetic nanoparticle based dual imaging probe exhibits a significant longer lymph node retention time. Near infrared signals from nanoparticle conjugated near infrared dyes last up to 60 min in sentinel lymph node compared to that of 25 min for the free near infrared dyes in a mouse model. Furthermore, axillary lymph nodes, in addition to sentinel lymph nodes, can be also visualized with this probe, given its slow clearance and sufficient sensitivity. Therefore, this new dual modality imaging probe with the tissue penetration and sensitive detection of sentinel lymph nodes can be applied for preoperative survey of lymph nodes with magnetic resonance imaging and allows intraoperative sentinel lymph node mapping using near infrared optical devices. PMID:23812946

  17. A dual-modal magnetic nanoparticle probe for preoperative and intraoperative mapping of sentinel lymph nodes by magnetic resonance and near infrared fluorescence imaging.

    PubMed

    Zhou, Zhengyang; Chen, Hongwei; Lipowska, Malgorzata; Wang, Liya; Yu, Qiqi; Yang, Xiaofeng; Tiwari, Diana; Yang, Lily; Mao, Hui

    2013-07-01

    The ability to reliably detect sentinel lymph nodes for sentinel lymph node biopsy and lymphadenectomy is important in clinical management of patients with metastatic cancers. However, the traditional sentinel lymph node mapping with visible dyes is limited by the penetration depth of light and fast clearance of the dyes. On the other hand, sentinel lymph node mapping with radionucleotide technique has intrinsically low spatial resolution and does not provide anatomic details in the sentinel lymph node mapping procedure. This work reports the development of a dual modality imaging probe with magnetic resonance and near infrared imaging capabilities for sentinel lymph node mapping using magnetic iron oxide nanoparticles (10 nm core size) conjugated with a near infrared molecule with emission at 830 nm. Accumulation of magnetic iron oxide nanoparticles in sentinel lymph nodes leads to strong T2 weighted magnetic resonance imaging contrast that can be potentially used for preoperative localization of sentinel lymph nodes, while conjugated near infrared molecules provide optical imaging tracking of lymph nodes with a high signal to background ratio. The new magnetic nanoparticle based dual imaging probe exhibits a significant longer lymph node retention time. Near infrared signals from nanoparticle conjugated near infrared dyes last up to 60 min in sentinel lymph node compared to that of 25 min for the free near infrared dyes in a mouse model. Furthermore, axillary lymph nodes, in addition to sentinel lymph nodes, can be also visualized with this probe, given its slow clearance and sufficient sensitivity. Therefore, this new dual modality imaging probe with the tissue penetration and sensitive detection of sentinel lymph nodes can be applied for preoperative survey of lymph nodes with magnetic resonance imaging and allows intraoperative sentinel lymph node mapping using near infrared optical devices. PMID:23812946

  18. Fixing All Moduli for M-Theory on K3xK3

    SciTech Connect

    Aspinwall, Paul S.; Kallosh, Renata; /Stanford U., Phys. Dept.

    2005-06-15

    We analyze M-theory compactified on K3 x K3 with fluxes preserving half the supersymmetry and its F-theory limit, which is dual to an orientifold of the type IIB string on K3 x (T{sup 2}/Z{sub 2}). The geometry of attractive K3 surfaces plays a significant role in the analysis. We prove that the number of choices for the K3 surfaces is finite and we show how they can be completely classified. We list the possibilities in one case. We then study the instanton effects and see that they will generically fix all of the moduli. We also discuss situations where the instanton effects might not fix all the moduli.

  19. Laboratory Detection of IZnCH_{3} (X^{1}A_{1}) : Further Evidence for Zinc Insertion

    NASA Astrophysics Data System (ADS)

    Bucchino, Matthew P.; Young, Justin P.; Sheridan, Phil M.; Ziurys, Lucy M.

    2013-06-01

    Millimeter-wave direct absorption techniques were used to record the pure rotational spectrum of IZnCH_{3} (X^{1}A_{1}). This species was produced by the reaction of zinc vapor with ICH_{3} in the presence of a DC discharge. Rotational transitions ranging from J = 109 {→} 108 to J = 122 {→} 121 were recorded for I^{64}ZnCH_{3} and I^{66}ZnCH_{3} in the frequency range of 250{-290} GHz. The Ka = 0{-4} components were measured for each transition, with the K-ladder structure and nuclear spin statistics indicative of a symmetric top. As with HZnCH_{3} (X^{1}A_{1}), the detection of IZnCH_{3} provides further evidence for a zinc insertion process.

  20. Nanocrystals of Cesium Lead Halide Perovskites (CsPbX3, X = Cl, Br, and I): Novel Optoelectronic Materials Showing Bright Emission with Wide Color Gamut

    PubMed Central

    2015-01-01

    Metal halides perovskites, such as hybrid organic–inorganic CH3NH3PbI3, are newcomer optoelectronic materials that have attracted enormous attention as solution-deposited absorbing layers in solar cells with power conversion efficiencies reaching 20%. Herein we demonstrate a new avenue for halide perovskites by designing highly luminescent perovskite-based colloidal quantum dot materials. We have synthesized monodisperse colloidal nanocubes (4–15 nm edge lengths) of fully inorganic cesium lead halide perovskites (CsPbX3, X = Cl, Br, and I or mixed halide systems Cl/Br and Br/I) using inexpensive commercial precursors. Through compositional modulations and quantum size-effects, the bandgap energies and emission spectra are readily tunable over the entire visible spectral region of 410–700 nm. The photoluminescence of CsPbX3 nanocrystals is characterized by narrow emission line-widths of 12–42 nm, wide color gamut covering up to 140% of the NTSC color standard, high quantum yields of up to 90%, and radiative lifetimes in the range of 1–29 ns. The compelling combination of enhanced optical properties and chemical robustness makes CsPbX3 nanocrystals appealing for optoelectronic applications, particularly for blue and green spectral regions (410–530 nm), where typical metal chalcogenide-based quantum dots suffer from photodegradation. PMID:25633588

  1. Magnetic and Structural Properties of Rapidly Quenched Tetragonal Mn3-xGa Nanostructures

    SciTech Connect

    Huh, Y; Kharel, P; Shah, VR; Krage, E; Skomski, R; Shield, JE; Sellmyer, DJ

    2013-07-01

    Nanostructured Mn3-x Ga ribbons with x = 0, 0.4, 0.9 and 1.1 were prepared using arc-melting, melt-spinning and annealing. As-spun samples crystallized into hexagonal D0(19) and cubic L2(1) Heusler crystal structures based on the concentration of Mn in Mn3-xGa. Upon vacuum-annealing the samples at 450 degrees C for about 50 hours, both the hexagonal and cubic structures transformed into a tetragonal D0(22) structure. High-temperature x-ray diffraction and high-temperature magnetometry showed that the samples with low Mn content (Mn-1.9 Ga and Mn-2.1 Ga) retain their tetragonal structure up to 850 K but the samples with high Mn concentrations (Mn-2.6 Ga and Mn-3.0 Ga) undergo a structural phase transition from tetragonal to hexagonal phases around 800 K. The magnetic properties of Mn3-x Ga ribbons were very sensitive to Mn concentration, where the magnetization and anisotropy energy increased and the coercivity decreased as x increased from 0 to 1.1. Although the Curie temperatures of Mn-2.6 Ga and Mn-3.0 Ga samples could not be determined because of the structural phase transition, the Curie temperature decreased with increasing x in Mn3-x Ga. The maximum magnetization of 57 emu/g (300 emu/cm(3)) and the coercivity of 6.5 kOe were measured in the Mn-1.9 Ga and Mn-3.0 Ga ribbons, respectively.

  2. Interaction between body weight status and walking speed in steps monitoring by GT3X accelerometer.

    PubMed

    Bélanger, Marie-Lyse; Kestens, Yan; Gilbert, Jo-Anne; Tremblay, Angelo; Mathieu, Marie-Eve

    2014-08-01

    The measurement error of the step count function of the ActiGraph GT3X accelerometer was assessed at different walking speeds in 12 obese and 16 nonobese individuals. In comparison with visual verification, the accelerometer step count function measurement error was larger for obese individuals walking at low speeds (2.5 km·h(-1)). This error equated to an approximate 50% underestimation at these speeds.

  3. Design strategy for integrating DSA via patterning in sub-7 nm interconnects

    NASA Astrophysics Data System (ADS)

    Karageorgos, Ioannis; Ryckaert, Julien; Tung, Maryann C.; Wong, H.-S. P.; Gronheid, Roel; Bekaert, Joost; Karageorgos, Evangelos; Croes, Kris; Vandenberghe, Geert; Stucchi, Michele; Dehaene, Wim

    2016-03-01

    In recent years, major advancements have been made in the directed self-assembly (DSA) of block copolymers (BCPs). As a result, the insertion of DSA for IC fabrication is being actively considered for the sub-7nm nodes. At these nodes the DSA technology could alleviate costs for multiple patterning and limit the number of litho masks that would be required per metal layer. One of the most straightforward approaches for DSA implementation would be for via patterning through templated DSA, where hole patterns are readily accessible through templated confinement of cylindrical phase BCP materials. Our in-house studies show that decomposition of via layers in realistic circuits below the 7nm node would require at least many multi-patterning steps (or colors), using 193nm immersion lithography. Even the use of EUV might require double patterning in these dimensions, since the minimum via distance would be smaller than EUV resolution. The grouping of vias through templated DSA can resolve local conflicts in high density areas. This way, the number of required colors can be significantly reduced. For the implementation of this approach, a DSA-aware mask decomposition is required. In this paper, our design approach for DSA via patterning in sub-7nm nodes is discussed. We propose options to expand the list of DSA-compatible via patterns (DSA letters) and we define matching cost formulas for the optimal DSA-aware layout decomposition. The flowchart of our proposed approach tool is presented.

  4. WO3-x Nanoplates Grown on Carbon Nanofibers for an Efficient Electrocatalytic Hydrogen Evolution Reaction.

    PubMed

    Chen, JiaDong; Yu, DanNi; Liao, WeiSha; Zheng, MengDan; Xiao, LongFei; Zhu, Han; Zhang, Ming; Du, MingLiang; Yao, JuMing

    2016-07-20

    The search for non-noble metal catalysts with high activity for the hydrogen evolution reaction (HER) is crucial for efficient hydrogen production at low cost and on a large scale. Herein, we report a novel WO3-x catalyst synthesized on carbon nanofiber mats (CFMs) by electrospinning and followed by a carbonization process in a tubal furnace. The morphology and composition of the catalysts were tailored via a simple method, and the hybrid catalyst mats were used directly as cathodes to investigate their HER performance. Notably, the as-prepared catalysts exhibit substantially enhanced activity for the HER, demonstrating a small overpotential, a high exchange current density, and a large cathodic current density. The remarkable electrocatalytic performances result from the poor crystallinity of WO3-x, the high electrical conductivity of WO3-x, and the use of electrospun CNFs. The present work outlines a straightforward approach for the synthesis of transition metal oxide (TMO)-based carbon nanofiber mats with promising applications for the HER. PMID:27356101

  5. Unexpected structural softening of interstitial boron solid solution WB{sub 3+x}

    SciTech Connect

    Wu, Hao; Sun, Hong E-mail: chen@physics.unlv.edu; Chen, Changfeng E-mail: chen@physics.unlv.edu

    2014-11-24

    Using first-principles calculations, we reveal an unexpected structural softening in a recently proposed WB{sub 3+x} structural model that tries to explain the X-ray diffraction, high resolution TEM, pressure dependence of the normalized lattice c/a ratio, and hardness experimental results of the synthesized tungsten boride compounds with a nominal composition WB{sub 4}. We show that the interstitial boron in WB{sub 3+x}, which was proposed to strengthen the covalent bonding network, unexpectedly weakens the atomic bonding, resulting in a large reduction of its indentation strength to well below that of WB{sub 3}. This is in direct contradiction to the experimental results showing that synthesized WB{sub 4} is harder than WB{sub 3}. The unusual structural softening is attributed to the unique three-center covalent bonding formed by the interstitial boron atoms that can easily deform under indentation. Our results show that the proposed interstitial boron solid solution WB{sub 3+x} structure is incompatible with experimental results, which calls for further investigations to determine the crystal structure of the synthesized WB{sub 4}.

  6. Exome sequencing identifies somatic mutations of DDX3X in natural killer/T-cell lymphoma.

    PubMed

    Jiang, Lu; Gu, Zhao-Hui; Yan, Zi-Xun; Zhao, Xia; Xie, Yin-Yin; Zhang, Zi-Guan; Pan, Chun-Ming; Hu, Yuan; Cai, Chang-Ping; Dong, Ying; Huang, Jin-Yan; Wang, Li; Shen, Yang; Meng, Guoyu; Zhou, Jian-Feng; Hu, Jian-Da; Wang, Jin-Fen; Liu, Yuan-Hua; Yang, Lin-Hua; Zhang, Feng; Wang, Jian-Min; Wang, Zhao; Peng, Zhi-Gang; Chen, Fang-Yuan; Sun, Zi-Min; Ding, Hao; Shi, Ju-Mei; Hou, Jian; Yan, Jin-Song; Shi, Jing-Yi; Xu, Lan; Li, Yang; Lu, Jing; Zheng, Zhong; Xue, Wen; Zhao, Wei-Li; Chen, Zhu; Chen, Sai-Juan

    2015-09-01

    Natural killer/T-cell lymphoma (NKTCL) is a malignant proliferation of CD56(+) and cytoCD3(+) lymphocytes with aggressive clinical course, which is prevalent in Asian and South American populations. The molecular pathogenesis of NKTCL has largely remained elusive. We identified somatic gene mutations in 25 people with NKTCL by whole-exome sequencing and confirmed them in an extended validation group of 80 people by targeted sequencing. Recurrent mutations were most frequently located in the RNA helicase gene DDX3X (21/105 subjects, 20.0%), tumor suppressors (TP53 and MGA), JAK-STAT-pathway molecules (STAT3 and STAT5B) and epigenetic modifiers (MLL2, ARID1A, EP300 and ASXL3). As compared to wild-type protein, DDX3X mutants exhibited decreased RNA-unwinding activity, loss of suppressive effects on cell-cycle progression in NK cells and transcriptional activation of NF-κB and MAPK pathways. Clinically, patients with DDX3X mutations presented a poor prognosis. Our work thus contributes to the understanding of the disease mechanism of NKTCL. PMID:26192917

  7. High Curie temperature and coercivity performance of Fe3-xCrxSe4 nanostructures.

    PubMed

    Li, Shao-jie; Li, Da; Liu, Wei; Zhang, Zhidong

    2015-03-12

    Monoclinic Fe3-xCrxSe4 nanostructures (0≤x≤2.5) were synthesized using a high-temperature solution chemical method. With increasing the Cr doping, the peak positions in the X-ray diffraction (XRD) patterns of Fe3-xCrxSe4 nanostructures slightly shifted to lower 2θ values due to the changes in lattice parameters. Expansions in the unit cell volumes of Fe3-xCrxSe4 nanostructures (x>0.3) may have been responsible for enhancing the ferromagnetic (FM) interaction between magnetic ions, which resulted in a significant increase in the Curie temperature (TC) from 331 K for Fe3Se4 to 429 K for FeCr2Se4, distinctly differing from the magnetic properties of the corresponding bulk materials. A room-temperature coercivity (HC) analysis showed an obvious increase from 3.2 kOe for Fe3Se4 to 12 kOe for Fe2.3Cr0.7Se4 nanostructure, but gradually decreased upon further increasing the Cr content.

  8. Bodega Ocean Observing Node (BOON).

    NASA Astrophysics Data System (ADS)

    Largier, J. L.; Chow, V. I.; Williams, S. L.; Botsford, L. W.; Morgan, S. G.; Nyden, B.; Tustin, J. A.; McAfee, S.; Shideler, D.

    2004-12-01

    The Bodega Ocean Observing Node (BOON) is comprised of radar mapping of surface currents, a moored current profiler, and shoreline oceanographic and meteorological observations. Ongoing shoreline data on temperature and salinity date back to 1955, with continuous records of sealevel, wind, meteorology, and chlorophyll fluorescence starting more recently. Radar observations started in 2001 with deployment of two CODAR antennae. Together with a third CODAR unit deployed in 2002, these provide coverage from Pt Reyes north to the CODE line. Real-time ADCP data from the mooring started in late 2004. Plans include nearshore wave data, CTD/fluorescence data from the mooring, and deployment of a nutrient sensor at the shoreline. This coastal ocean observing node is part of the state-funded COCMP-NC program and the CeNCOOS regional association for central and northern California. Ancillary regional data are available on offshore winds (NDBC buoys), offshore waves (CDIP buoy), river flow, and satellite observations. The value of this suite of measurements is built on (1) detailed understanding of circulation, derived from WEST, CODE, and other prior studies of this region, including mesoscale atmosphere and ocean modeling, (2) active integration of circulation patterns in ongoing studies of planktonic and benthic ecology, and (3) direct interaction with local, state and federal agencies with interest in this region. To-date, the ongoing data series have shown potential for improved understanding and monitoring of fishery populations such as salmon and crab, as well as water quality concerns including oil spills and toxic pollutants. Through an active involvement in local studies and environmental management issues, BOON seeks to develop alternatives to supply-side thinking in the design of coastal ocean observing systems. BOON is based at the Bodega Marine Laboratory and thus provides invaluable support for academic study of more fundamental questions, such as carbon budgets

  9. A four-interleaving HBD SRAM cell based on dual DICE for multiple node collection mitigation

    NASA Astrophysics Data System (ADS)

    Lin, Liu; Suge, Yue; Shijin, Lu

    2015-11-01

    A 4-interleaving cell of 2-dual interlocked cells (DICE) is proposed, which reduces single event induced multiple node collection between the sensitive nodes of sensitive pairs in a DICE storage cell in 65 nm technology. The technique involves the 4-interleaving of dual DICE cells at a layout level to meet the required spacing between sensitive nodes in an area-efficient manner. Radiation experiments using a 65 nm CMOS test chip demonstrate that the LETth of our 4-interleaving cell of dual DICE encounters are almost 4× larger and the SEU cross section per bit for our proposed dual DICE design is almost two orders of magnitude less compared to the reference traditional DICE cell.

  10. Sub-20nm hybrid lithography using optical, pitch-division, and e-beam

    NASA Astrophysics Data System (ADS)

    Belledent, J.; Smayling, M.; Pradelles, J.; Pimenta-Barros, P.; Barnola, S.; Mage, L.; Icard, B.; Lapeyre, C.; Soulan, S.; Pain, L.

    2012-03-01

    A roadmap extending far beyond the current 22nm CMOS node has been presented several times. [1] This roadmap includes the use of a highly regular layout style which can be decomposed into "lines and cuts."[2] The "lines" can be done with existing optical immersion lithography and pitch division with self-aligned spacers.[3] The "cuts" can be done with either multiple exposures using immersion lithography, or a hybrid solution using either EUV or direct-write ebeam.[ 4] The choice for "cuts" will be driven by the availability of cost-effective, manufacturing-ready equipment and infrastructure. Optical lithography improvements have enabled scaling far beyond what was expected; for example, soft x-rays (aka EUV) were in the semiconductor roadmap as early as 1994 since optical resolution was not expected for sub-100nm features. However, steady improvements and innovations such as Excimer laser sources and immersion photolithography have allowed some manufacturers to build 22nm CMOS SOCs with single-exposure optical lithography. With the transition from random complex 2D shapes to regular 1D-patterns at 28nm, the "lines and cuts" approach can extend CMOS logic to at least the 7nm node. The spacer double patterning for lines and optical cuts patterning is expected to be used down to the 14nm node. In this study, we extend the scaling to 18nm half-pitch which is approximately the 10-11nm node using spacer pitch division and complementary e-beam lithography. For practical reasons, E-Beam lithography is used as well to expose the "mandrel" patterns that support the spacers. However, in a production mode, it might be cost effective to replace this step by a standard 193nm exposure and applying the spacer technique twice to divide the pitch by 3 or 4. The Metal-1 "cut" pattern is designed for a reasonably complex logic function with ~100k gates of combinatorial logic and flip-flops. Since the final conductor is defined by a Damascene process, the "cut" patterns become islands

  11. Enhancement of photoelectric response of bacteriorhodopsin by multilayered WO3 x H2O nanocrystals/PVA membrane.

    PubMed

    Li, Rui; Hu, Fengping; Bao, Qiaoliang; Bao, Shujuan; Qiao, Yan; Yu, Shucong; Guo, Jun; Li, Chang Ming

    2010-02-01

    For the first time, a multilayered WO(3) x H(2)O/PVA membrane on bacteriorhodopsin (bR) is constructed to significantly enhance the photoelectric response of bR by the spillover effect of WO(3) x H(2)O nanocrystals, providing great potential in its important applications in bioelectronics and proton exchange membrane fuel cells.

  12. Flexible electrochromics: magnetron sputtered tungsten oxide (WO3-x) thin films on Lexan (optically transparent polycarbonate) substrates

    NASA Astrophysics Data System (ADS)

    Uday Kumar, K.; Murali, Dhanya S.; Subrahmanyam, A.

    2015-06-01

    Tungsten oxide (WO3-x) based electrochromics on flexible substrates is a topic of recent interest. The present communication reports the electrochromic properties of WO3-x thin films grown on lexan, an optically transparent polycarbonate thermoplastic substrate. The WO3-x films are prepared at room temperature (300 K) by the reactive DC magnetron sputtering technique. The physical properties of metal oxide thin films are known to be controlled by the oxygen stoichiometry of the film. In the present work, the WO3-x thin films are prepared by varying the oxygen flow rates. All the WO3-x thin films are amorphous in nature. The electrochromic performance of the WO3-x thin films is evaluated by cyclic voltammetry measurements on tin doped indium oxide (ITO) coated lexan and glass substrates. The optical band gap of WO3-x thin films grown on lexan substrates (at any given oxygen flow rate) is significantly higher than those grown on glass substrates. The coloration efficiency of WO3-x thin films (at an oxygen flow rate of 10 sccm) on lexan substrates is: 143.9 cm2 C-1 which is higher compared to that grown on glass: 90.4 cm2 C-1.

  13. EUV actinic defect inspection and defect printability at the sub-32 nm half pitch

    SciTech Connect

    Huh, Sungmin; Kearney, Patrick; Wurm, Stefan; Goodwin, Frank; Han, Hakseung; Goldberg, Kenneth; Mochi, Iacopp; Gullikson, Eric M.

    2009-08-01

    Extreme ultraviolet (EUV) mask blanks with embedded phase defects were inspected with a reticle actinic inspection tool (AIT) and the Lasertec M7360. The Lasertec M7360, operated at SEMA TECH's Mask Blank Development Center (MBDC) in Albany, NY, has a sensitivity to multilayer defects down to 40-45 nm, which is not likely sufficient for mask blank development below the 32 nm half-pitch node. Phase defect printability was simulated to calculate the required defect sensitivity for a next generation blank inspection tool to support reticle development for the sub-32 nm half-pitch technology node. Defect mitigation technology is proposed to take advantage of mask blanks with some defects. This technology will reduce the cost of ownership of EUV mask blanks. This paper will also discuss the kind of infrastructure that will be required for the development and mass production stages.

  14. On the photochemistry of IONO2: absorption cross section (240-370 nm) and photolysis product yields at 248 nm.

    PubMed

    Joseph, D M; Ashworth, S H; Plane, J M C

    2007-11-01

    The absolute absorption cross section of IONO(2) was measured by the pulsed photolysis at 193 nm of a NO(2)/CF(3)I mixture, followed by time-resolved Fourier transform spectroscopy in the near-UV. The resulting cross section at a temperature of 296 K over the wavelength range from 240 to 370 nm is given by log(10)(sigma(IONO(2))/cm(2) molecule(-1)) = 170.4 - 3.773 lambda + 2.965 x 10(-2)lambda(2)- 1.139 x 10(-4)lambda(3) + 2.144 x 10(-7)lambda(4)- 1.587 x 10(-10)lambda(5), where lambda is in nm; the cross section, with 2sigma uncertainty, ranges from (6.5 +/- 1.9) x 10(-18) cm(2) at 240 nm to (5 +/- 3) x 10(-19) cm(2) at 350 nm, and is significantly lower than a previous measurement [J. C. Mössinger, D. M. Rowley and R. A. Cox, Atmos. Chem. Phys., 2002, 2, 227]. The photolysis quantum yields for IO and NO(3) production at 248 nm were measured using laser induced fluorescence of IO at 445 nm, and cavity ring-down spectroscopy of NO(3) at 662 nm, yielding phi(IO)

  15. Sex steroid levels and AD-like pathology in 3xTgAD mice.

    PubMed

    Overk, C R; Perez, S E; Ma, C; Taves, M D; Soma, K K; Mufson, E J

    2013-02-01

    Decreases in testosterone and 17β-oestradiol (E(2)) are associated with an increased risk for Alzheimer's disease (AD), which has been attributed to an increase in β-amyloid and tau pathological lesions. Although recent studies have used transgenic animal models to test the effects of sex steroid manipulations on AD-like pathology, almost none have systematically characterised the associations between AD lesions and sex steroid levels in the blood or brain in any mutant model. The present study evaluated age-related changes in testosterone and E(2) concentrations, as well as androgen receptor (AR) and oestrogen receptor (ER) α and β expression, in brain regions displaying AD pathology in intact male and female 3xTgAD and nontransgenic (ntg) mice. We report for the first time that circulating and brain testosterone levels significantly increase in male 3xTgAD mice with age, but without changes in AR-immunoreactive (IR) cell number in the hippocampal CA1 or medial amygdala. The age-related increase in hippocampal testosterone levels correlated positively with increases in the conformational tau isoform, Alz50. These data suggest that the over-expression of human tau up-regulate the hypothalamic-pituitary-gonadal axis in these mice. Although circulating and brain E(2) levels remained stable with age in both male and female 3xTgAD and ntg mice, ER-IR cell number in the hippocampus and medial amygdala decreased with age in female transgenic mice. Furthermore, E(2) levels were significantly higher in the hippocampus than in serum, suggesting local production of E(2). Although triple transgenic mice mimic AD-like pathology, they do not fully replicate changes in human sex steroid levels, and may not be the best model for studying the effects of sex steroids on AD lesions.

  16. Cytological and breeding behavior of pentaploids derived from 3x x 4x crosses in potato.

    PubMed

    Carputo, D

    2003-03-01

    Cytology and breeding behavior of Solanum commersonii - S. tuberosum hybrids derived from 3 x x 4 x crosses was examined. The chromosome number of hybrids ranged from hypo-pentaploid (2 n=5 x - 8=52), to hyper-pentaploid (2 n=5 x + 7=67), with the euploid pentaploid 2 n=5 x=60 class predominant. The high variability in chromosome number of the 3 x x 4 x hybrids was attributed to the fact that meiotic restitution during megasporogenesis of the 3 x female may have involved poles with various chromosome numbers, resulting in 2 n eggs with 24-48 chromosomes. Microsporogenesis analyses provided evidence that chromosome pairing between S. commersonii and S. tuberosum genomes occurred. In addition, chromosome distribution at anaphase I and anaphase II revealed an average chromosome number of 29.5 and 29.1 per pole, respectively. To further study the extent of transmission of extra genome chromosomes from pentaploids, 5 x x 4 x and 4 x x 5 x crosses were performed, and the chromosome number of resulting progeny was determined. Ploidy ranged from 2 n=4 x=48 to 2 n=5 x=60 following 5 x x 4 x crosses, and from 2 n=4 x + 1=49 to 2 n=5 x=60 following 4 x x 5 x crosses. These results provided indirect evidence that the pentaploid hybrids produced viable aneuploid gametes with a chromosome number ranging from 24 to 36. They also demonstrated that gametes with large numbers of extra chromosomes can be functional, resulting in sporophytes between the 4 x and 5 x ploidy level. Fertility parameters of crosses involving various (aneuploid) pentaploid genotypes were not influenced by chromosome number, suggesting a buffering effect of polyploidy on aneuploidy. The possibility of successfully using (aneuploid) pentaploid genotypes for further breeding efforts is discussed. PMID:12647063

  17. Autoimmune Manifestations in the 3xTg-AD Model of Alzheimer's Disease

    PubMed Central

    Marchese, Monica; Cowan, David; Head, Elizabeth; Ma, Donglai; Karimi, Khalil; Ashthorpe, Vanessa; Kapadia, Minesh; Zhao, Hui; Davis, Paulina; Sakic, Boris

    2015-01-01

    Background Immune system activation is frequently reported in patients with Alzheimer's disease (AD). However, it remains unknown whether this is a cause, a consequence, or an epiphenomenon of brain degeneration. Objective The present study examines whether immunological abnormalities occur in a well-established murine AD model and if so, how they relate temporally to behavioral deficits and neuropathology. Methods A broad battery of tests was employed to assess behavioral performance and autoimmune/inflammatory markers in 3xTg-AD (AD) mice and wild type controls from 1.5 to 12 months of age. Results Aged AD mice displayed severe manifestations of systemic autoimmune/inflammatory disease, as evidenced by splenomegaly, hepatomegaly, elevated serum levels of anti-nuclear/anti-dsDNA antibodies, low hematocrit, and increased number of double-negative T splenocytes. However, anxiety-related behavior and altered spleen function were evident as early as 2 months of age, thus preceding typical AD-like brain pathology. Moreover, AD mice showed altered olfaction and impaired “cognitive” flexibility in the first 6 months of life, suggesting mild cognitive impairment-like manifestations before general learning/memory impairments emerged at an older age. Interestingly, all of these features were present in 3xTg-AD mice prior to significant amyloid-β or tau pathology. Conclusion The results indicate that behavioral deficits in AD mice develop in parallel with systemic autoimmune/inflammatory disease. These changes antedate AD-like neuropathology, thus supporting a causal link between autoimmunity and aberrant behavior. Consequently, 3xTg-AD mice may be a useful model in elucidating the role of immune system in the etiology of AD. PMID:24150111

  18. Classification between Failed Nodes and Left Nodes in Mobile Asset Tracking Systems †

    PubMed Central

    Kim, Kwangsoo; Jin, Jae-Yeon; Jin, Seong-il

    2016-01-01

    Medical asset tracking systems track a medical device with a mobile node and determine its status as either in or out, because it can leave a monitoring area. Due to a failed node, this system may decide that a mobile asset is outside the area, even though it is within the area. In this paper, an efficient classification method is proposed to separate mobile nodes disconnected from a wireless sensor network between nodes with faults and a node that actually has left the monitoring region. The proposed scheme uses two trends extracted from the neighboring nodes of a disconnected mobile node. First is the trend in a series of the neighbor counts; the second is that of the ratios of the boundary nodes included in the neighbors. Based on such trends, the proposed method separates failed nodes from mobile nodes that are disconnected from a wireless sensor network without failures. The proposed method is evaluated using both real data generated from a medical asset tracking system and also using simulations with the network simulator (ns-2). The experimental results show that the proposed method correctly differentiates between failed nodes and nodes that are no longer in the monitoring region, including the cases that the conventional methods fail to detect. PMID:26901200

  19. Sinus node dysfunction complicating viper bite.

    PubMed

    Agarwal, Ashish; Kumar, Tarun; Ravindranath, Khandenahally S; Bhat, Prabhavathi; Manjunath, Cholenahally N; Agarwal, Neena

    2015-02-01

    Viper venom toxicities comprise mainly bleeding disorders and nephrotoxicity. Cardiotoxicity is a rare manifestation of viper bite. We describe the case of a previously healthy 35-year-old man who developed coagulopathy and sinus node dysfunction following a viper bite. Electrocardiography showed sinus arrest and junctional escape rhythm. This is the first account of sinus node dysfunction caused by a viper bite.

  20. Sinus node dysfunction: recognition and treatment.

    PubMed

    Rusk, Karla; Scordo, Kristine

    2012-12-10

    Sinus node dysfunction (SND) refers to a wide range of abnormalities involving sinus node and atrial impulse generation and propagation. SND occurs at any age and is commonly encountered in clinical practice. Clinicians must be able to accurately diagnose this syndrome, which can present from asymptomatic bradycardia to atrial standstill.

  1. A multiple node software development environment

    SciTech Connect

    Heinicke, P.; Nicinski, T.; Constanta-Fanourakis, P.; Petravick, D.; Pordes, R.; Ritchie, D.; White, V.

    1987-06-01

    Experimenters on over 30 DECnet nodes at Fermilab use software developed, distributed, and maintained by the Data Acquisition Software Group. A general methodology and set of tools have been developed to distribute, use and manage the software on different sites. The methodology and tools are of interest to any group developing and using software on multiple nodes.

  2. Testnodes: a Lightweight Node-Testing Infrastructure

    NASA Astrophysics Data System (ADS)

    Fay, R.; Bland, J.

    2014-06-01

    A key aspect of ensuring optimum cluster reliability and productivity lies in keeping worker nodes in a healthy state. Testnodes is a lightweight node testing solution developed at Liverpool. While Nagios has been used locally for general monitoring of hosts and services, Testnodes is optimised to answer one question: is there any reason this node should not be accepting jobs? This tight focus enables Testnodes to inspect nodes frequently with minimal impact and provide a comprehensive and easily extended check with each inspection. On the server side, Testnodes, implemented in python, interoperates with the Torque batch server to control the nodes production status. Testnodes remotely and in parallel executes client-side test scripts and processes the return codes and output, adjusting the node's online/offline status accordingly to preserve the integrity of the overall batch system. Testnodes reports via log, email and Nagios, allowing a quick overview of node status to be reviewed and specific node issues to be identified and resolved quickly. This presentation will cover testnodes design and implementation, together with the results of its use in production at Liverpool, and future development plans.

  3. Mediastinal lymph node size in lung cancer

    SciTech Connect

    Libshitz, H.I.; McKenna, R.J. Jr.

    1984-10-01

    Using a size criterion of 1 cm or greater as evidence for abnormality, the size of mediastinal lymph nodes identified by computed tomography (CT) was a poor predictor of mediastinal lymph node metastases in a series of 86 patients who had surgery for bronchogenic carcinoma. The surgery included full nodal sampling in all patients. Of the 86 patients, 36 had nodes greater than or equal to 1 cm identified by CT. Of the 21 patients with mediastinal metastases proven at surgery, 14 had nodes greater than or equal to 1 cm (sensitivity = 67%). Of the 65 patients without mediastinal metastases, 22 had nodes greater than or equal to 1 cm. Obstructive pneumonia and/or pulmonary collapse distal to the cancer was present in 39 patients (45%). Obstructive pneumonia and/or pulmonary collapse is a common occurrence in bronchogenic carcinoma, but mediastinal nodes greater than or equal to 1 cm in this circumstance cannot be presumed to represent metastatic disease. Metastatic mediastinal lymph node involvement was related to nodal size also in patients with evidence of prior granulomatous disease and in patients with no putative benign cause for nodes greater than or equal to 1 cm.

  4. Front-end-of-line process development using 193-nm lithography

    NASA Astrophysics Data System (ADS)

    Pollentier, Ivan K.; Ercken, Monique; Eliat, Astrid; Delvaux, Christie; Jaenen, Patrick; Ronse, Kurt G.

    2001-04-01

    It is expected that 193nm lithography will be introduced in front-end-of-line processing for all critical layers at the 100nm node, and possibly also for some layers at the 130nm node, where critical layers are required to have the lowest mask cost. These processes are currently being investigated at IMEC for CMOS logic applications. While the lithographic performance of 193 nm resists has improved significantly in the last year, most materials still have important processing issues that need further improvement. On one hand, the resists material itself suffers from for example poor dry etch resistance and SEM CD shrinkage. On the other hand, interaction with other materials such as SiON inorganic ARCs becomes more challenging in terms of footing behavior, adhesion, and line edge roughness. In this paper, the 193nm processing experience gained at IMEC will be outlined, as well as solutions for manufacturability. Front- end-of-line integration results will also be shown, mainly for gate applications. It will be demonstrated that currently several commercial resist are capable of printing 130nm gates within the +/- 10 percent CD tolerance, even after gate etch. The impact of line edge roughness will also be discussed. Finally, the feasibility of printing 100nm logic patterns using only binary masks has been demonstrated, including gate etch.

  5. Narrow-band tunable terahertz emission from ferrimagnetic Mn3-xGa thin films

    NASA Astrophysics Data System (ADS)

    Awari, N.; Kovalev, S.; Fowley, C.; Rode, K.; Gallardo, R. A.; Lau, Y.-C.; Betto, D.; Thiyagarajah, N.; Green, B.; Yildirim, O.; Lindner, J.; Fassbender, J.; Coey, J. M. D.; Deac, A. M.; Gensch, M.

    2016-07-01

    Narrow-band terahertz emission from coherently excited spin precession in metallic ferrimagnetic Mn3-xGa Heusler alloy nanofilms has been observed. The efficiency of the emission, per nanometer film thickness, is comparable or higher than that of classical laser-driven terahertz sources based on optical rectification. The center frequency of the emission from the films can be tuned precisely via the film composition in the range of 0.20-0.35 THz, making this type of metallic film a candidate for efficient on-chip terahertz emitters. Terahertz emission spectroscopy is furthermore shown to be a sensitive probe of magnetic properties of ultra-thin films.

  6. Colorless coherent receiver using 3x3 coupler hybrids and single-ended detection.

    PubMed

    Xie, Chongjin; Winzer, Peter J; Raybon, Gregory; Gnauck, Alan H; Zhu, Benyuan; Geisler, Tommy; Edvold, Bent

    2012-01-16

    We demonstrate a single-ended colorless coherent receiver using symmetric 3x3 couplers for optical hybrids. We show that the receiver can achieve colorless reception of fifty-five 112-Gb/s polarization-division-multiplexed quadrature-phase-shift-keyed (PDM-QPSK) channels with less than 1-dB penalty in the back-to-back operation. The receiver also works well in a long-haul wavelength-division-multiplexed (WDM) transmission system over 2560-km TrueWave® REACH fiber.

  7. High speed polling protocol for multiple node network

    NASA Technical Reports Server (NTRS)

    Kirkham, Harold (Inventor)

    1995-01-01

    The invention is a multiple interconnected network of intelligent message-repeating remote nodes which employs a remote node polling process performed by a master node by transmitting a polling message generically addressed to all remote nodes associated with the master node. Each remote node responds upon receipt of the generically addressed polling message by transmitting a poll-answering informational message and by relaying the polling message to other adjacent remote nodes.

  8. Thermochemical Properties and Bond Dissociation Energies for Fluorinated Methanol, CH3-xFxOH, and Fluorinated Methyl Hydroperoxides, CH3-xFxOOH: Group Additivity.

    PubMed

    Wang, Heng; Bozzelli, Joseph W

    2016-09-01

    Oxygenated fluorocarbons are routinely found in sampling of environmental soils and waters as a result of the widespread use of fluoro and chlorofluoro carbons as heat transfer fluids, inert materials, polymers, fire retardants and solvents; the influence of these chemicals on the environment is a growing concern. The thermochemical properties of these species are needed for understanding their stability and reactions in the environment and in thermal process. Structures and thermochemical properties on the mono- to trifluoromethanol, CH3-xFxOH, and fluoromethyl hydroperoxide, CH3-xFxOOH (1 ≤ x ≤ 3), are determined by CBS-QB3, CBS-APNO, and G4 calculations. Entropy, S°298, and heat capacities, Cp(T)'s (300 ≤ T/K ≤ 1500) from vibration, translation, and external rotation contributions are calculated on the basis of the vibration frequencies and structures obtained from the B3LYP/6-31+G(d,p) density functional method. Potential barriers for the internal rotations are also calculated from this method and used to calculate hindered rotor contributions to S°298 and Cp(T)'s using direct integration over energy levels of the internal rotational potentials. Standard enthalpies of formation, ΔfH°298 (units in kcal mol(-1)) are CH2FOOH (-83.7), CHF2OOH (-138.1), CF3OOH (-193.6), CH2FOO(•) (-44.9), CHF2OO(•) (-99.6), CF3OO(•) (-153.8), CH2FOH (-101.9), CHF2OH (-161.6), CF3OH (-218.1), CH2FO(•) (-49.1), CHF2O(•) (-97.8), CF3O(•) (-150.5), CH2F(•) (-7.6), CHF2(•) (-58.8), and CF3(•) (-112.6). Bond dissociation energies for the R-OOH, RO-OH, ROO-H, R-OO(•), RO-O(•), R-OH, RO-H, R-O(•), and R-H bonds are determined and compared with methyl hydroperoxide to observe the trends from added fluoro substitutions. Enthalpy of formation for the fluoro-hydrocarbon oxygen groups C/F/H2/O, C/F2/H/O, C/F3/O, are derived from the above fluorinated methanol and fluorinated hydroperoxide species for use in Benson's Group Additivity. It was determined that

  9. Locating influential nodes in complex networks

    PubMed Central

    Malliaros, Fragkiskos D.; Rossi, Maria-Evgenia G.; Vazirgiannis, Michalis

    2016-01-01

    Understanding and controlling spreading processes in networks is an important topic with many diverse applications, including information dissemination, disease propagation and viral marketing. It is of crucial importance to identify which entities act as influential spreaders that can propagate information to a large portion of the network, in order to ensure efficient information diffusion, optimize available resources or even control the spreading. In this work, we capitalize on the properties of the K-truss decomposition, a triangle-based extension of the core decomposition of graphs, to locate individual influential nodes. Our analysis on real networks indicates that the nodes belonging to the maximal K-truss subgraph show better spreading behavior compared to previously used importance criteria, including node degree and k-core index, leading to faster and wider epidemic spreading. We further show that nodes belonging to such dense subgraphs, dominate the small set of nodes that achieve the optimal spreading in the network. PMID:26776455

  10. Locating influential nodes in complex networks

    NASA Astrophysics Data System (ADS)

    Malliaros, Fragkiskos D.; Rossi, Maria-Evgenia G.; Vazirgiannis, Michalis

    2016-01-01

    Understanding and controlling spreading processes in networks is an important topic with many diverse applications, including information dissemination, disease propagation and viral marketing. It is of crucial importance to identify which entities act as influential spreaders that can propagate information to a large portion of the network, in order to ensure efficient information diffusion, optimize available resources or even control the spreading. In this work, we capitalize on the properties of the K-truss decomposition, a triangle-based extension of the core decomposition of graphs, to locate individual influential nodes. Our analysis on real networks indicates that the nodes belonging to the maximal K-truss subgraph show better spreading behavior compared to previously used importance criteria, including node degree and k-core index, leading to faster and wider epidemic spreading. We further show that nodes belonging to such dense subgraphs, dominate the small set of nodes that achieve the optimal spreading in the network.

  11. Expandable and reconfigurable instrument node arrays

    NASA Technical Reports Server (NTRS)

    Hilliard, Lawrence M. (Inventor); Deshpande, Manohar (Inventor)

    2012-01-01

    An expandable and reconfigurable instrument node includes a feature detection means and a data processing portion in communication with the feature detection means, the data processing portion configured and disposed to process feature information. The instrument node further includes a phase locked loop (PLL) oscillator in communication with the data processing portion, the PLL oscillator configured and disposed to provide PLL information to the processing portion. The instrument node further includes a single tone transceiver and a pulse transceiver in communication with the PLL oscillator, the single tone transceiver configured and disposed to transmit or receive a single tone for phase correction of the PLL oscillator and the pulse transceiver configured and disposed to transmit and receive signals for phase correction of the PLL oscillator. The instrument node further includes a global positioning (GPA) receiver in communication with the processing portion, the GPS receiver configured and disposed to establish a global position of the instrument node.

  12. Preparation and magnetocaloric effect of (La0.67-XGdX)Sr0.33MnO3 (X =0.1,0.15) nanoparticles

    NASA Astrophysics Data System (ADS)

    Wang, G.; Wang, Z.-D.; Zhang, L.-D.

    2005-05-01

    We report a new route to synthesize nanosized (La0.67-XGdX)Sr0.33MnO3 (X=0.1,0.15) perovskite crystalline complex oxides at calcination temperatures of 600-900 °C using amorphous molecular alloy as precursor. The precursor could completely decompose into oxide at temperatures below 500 °C according to thermogravimetric analysis and differential thermal analysis results. X-ray diffraction demonstrated that the decomposed species was composed of perovskite structure at a calcination temperature of 600 °C for 2 h. The size and topography of the oxides are dependent on the calcination temperature of the precursor. The resulting particle size is in the range of 40-120 nm as determined by a transmission electron microscope. This method is effective and can be easily quantitatively controlled to synthesize nanosized perovskite complex oxides. The Curie temperature TC and the magnetocaloric effect of (La0.67-XGdX)Sr0.33MnO3 (X=0.1,0.15) nanoparticles are discussed based on the measurement of the low-field magnetization curve and the isothermal magnetization curve.

  13. High-throughput characterization of Bi xY 3- xFe 5O 12 combinatorial thin films by magneto-optical imaging technique

    NASA Astrophysics Data System (ADS)

    Zhao, X. R.; Lu, W.-Q.; Okazaki, S.; Konishi, Y.; Akahane, K.; Ishibashi, T.; Sato, K.; Matsumoto, Y.; Koinuma, H.; Hasegawa, T.

    2006-01-01

    Bi xY 3- xFe 5O 12 thin films have been grown on GGG (Gd 3Ga 5O 12) (1 1 1) substrates by the combinatorial composition-spread techniques under substrate temperature ( Tsub) ranging from 410 to 700 °C and O 2 pressure of 200 mTorr. In order to study the effect of substrates on the deposition of Bi xY 3- xFe 5O 12 thin films, garnet substrates annealed at 1300 °C for 3 h were also used. Magneto-optical properties were characterized by our home-designed magneto-optical imaging system. From the maps of Faraday rotation angle θF, it was evident that the Faraday effect appears only when Tsub = 430-630 °C. θF reaches to the maximum value (˜6°/μm, λ = 632 nm) at 500 °C, and is proportional to the Bi contents. XRD and EPMA analyses showed that Bi ions are easier to substitute for Y sites and better crystallinity is obtained for annealed substrates than for commercial ones.

  14. Effect of cerium substitution on microstructure and Faraday rotation of Ce x Y3- x Fe5O12 thin films

    NASA Astrophysics Data System (ADS)

    Shahrokhvand, S. M.; Mozaffari, M.; Rozatian, A. S. H.; Hamidi, S. M.; Tehranchi, M. M.

    2016-01-01

    In this work, cerium-substituted yttrium iron garnet (Ce x Y3- x Fe5O12, x = 0.25-1) targets were fabricated by conventional ceramic method at different temperatures, and their crystal structures were investigated by X-ray diffraction method. The results showed that the minimum calcining temperature required to get single-phase targets depends on x value and decreased by increasing x value. Then, thin films of the targets were deposited on GGG (444) single-crystal substrates by pulsed laser deposition technique. Based on the previous studies, preferred (444) oriented Ce x Y3- x Fe5O12 thin films were fabricated under optimum conditions. Faraday rotation of the thin films was measured at 635 nm wavelength, and the results showed that Faraday rotation and sensitivity constant increased by increasing x value. Scanning electron microscope images showed that by increasing x value, cracks on the thin films' surface increased. Atomic force microscopy images showed that the films have smooth surfaces and the surface roughness decreased by increasing the x value.

  15. "XA6" octahedra influencing the arrangement of anionic groups and optical properties in inverse-perovskite [B6O10]XA3 (X = Cl, Br; A = alkali metal).

    PubMed

    Yang, Zhihua; Lei, Bing-Hua; Yang, Bin; Pan, Shilie

    2016-06-01

    Exploring the effect of microscopic units, which set up the perovsikte framework, is of importance for material design. In this study, a series of borate halides with inverse-perovskite structures [B6O10]XA3 (X = Cl, Br; A = alkali metal) have been studied. It was revealed that the distortion and volume of XA6 octahedra influence the arrangement of anionic groups, which leads to the flexibility of the perovskite-related framework and differences in optical properties. Under the structural control scheme, the structure of Rb3B6O10Cl was predicted. The stability of the predicted structure was confirmed by an ab initio density functional theory-based method. The calculation shows Rb3B6O10Cl has a short UV cutoff edge of less than 200 nm, a moderate birefringence and a large second harmonic generation response. PMID:27211304

  16. Transport Properties Of Fe3-xTixO4 (x = 0.0 and 0.0206) Epitaxial Thin Films

    NASA Astrophysics Data System (ADS)

    Varshney, Dinesh; Yogi, Arvind; Verma, K.; Phase, D. M.

    2011-07-01

    Fe3-xTixO4 (x = 0 and 0.0206) epitaxial thin films with thickness of 150 nm were prepared by pulsed-laser deposition technique on SrTiO3 (100), α-Al2O3 (0001), Si (111) and Float Glass substrates. X-ray diffraction (XRD) pattern infers that parent and Ti doped magnetites are grown in single phase with (111) orientation. The Verwey transition temperature for Fe3O4 thin films are 121 K (Float Glass), 123 K (SrTiO3), 123.5 K (α-Al2O3) and 128 K (Si). It is shown that the Ti doping at B site results in the disappearance of Verwey transition in {Tix4+Fe1-x3+Fe2+}O42-.

  17. Sentinel lymph nodes detection with an imaging system using Patent Blue V dye as fluorescent tracer

    NASA Astrophysics Data System (ADS)

    Tellier, F.; Steibel, J.; Chabrier, R.; Rodier, J. F.; Pourroy, G.; Poulet, P.

    2013-03-01

    Sentinel lymph node biopsy is the gold standard to detect metastatic invasion from primary breast cancer. This method can help patients avoid full axillary chain dissection, thereby decreasing the risk of morbidity. We propose an alternative to the traditional isotopic method, to detect and map the sentinel lymph nodes. Indeed, Patent Blue V is the most widely used dye in clinical routine for the visual detection of sentinel lymph nodes. A Recent study has shown the possibility of increasing the fluorescence quantum yield of Patent Blue V, when it is bound to human serum albumin. In this study we present a preclinical fluorescence imaging system to detect sentinel lymph nodes labeled with this fluorescent tracer. The setup is composed of a black and white CCD camera and two laser sources. One excitation source with a laser emitting at 635 nm and a second laser at 785 nm to illuminate the region of interest. The prototype is operated via a laptop. Preliminary experiments permitted to determine the device sensitivity in the μmol.L-1 range as regards the detection of PBV fluorescence signals. We also present a preclinical evaluation performed on Lewis rats, during which the fluorescence imaging setup detected the accumulation and fixation of the fluorescent dye on different nodes through the skin.

  18. Structural and magnetic properties of ZnxMn3-xO4 spinels

    NASA Astrophysics Data System (ADS)

    Nádherný, Ladislav; Maryško, Miroslav; Sedmidubský, David; Martin, Christine

    2016-09-01

    To study structural and magnetic properties of spinels a series of ceramic samples with a different Zn:Mn ratio was prepared by high-temperature annealing in air followed by quenching in liquid nitrogen. The spinels with nominal composition of ZnxMn3-xO4 (x=0-1.29) were characterized by means of X-ray diffraction, Raman spectroscopy, scanning electron microscopy and SQUID magnetometry. Two tetragonal spinels of the same I41/amd space-group were identified based on the crystallographic, vibrational and grain-morphology point of view and described in detail. The unit-cell parameters and phase ratio of the spinel phases were determined using Rietveld refinement. According to the factor-group analysis the majority of the vibrational modes were identified in the Raman spectra. The magnetic properties of ZnxMn3-xO4 spinels are in agreement with a model of nanoscale ferrimagnetic Mn3O4 clusters in the antiferromagnetic ZnMn2O4 matrix (TN≈60 K). New features are a constricted hysteresis loop for x=0.3, and the effect of defects on magnetic properties for high Zn content which points to a good quality of the samples prepared by a solid state reaction.

  19. Phonons in the ternary phase ZrS 3-xSe x

    NASA Astrophysics Data System (ADS)

    Zwick, A.; Landa, G.; Carles, R.; Renucci, M. A.; Kjekshus, A.

    1983-03-01

    The mode behaviour of long wavelength optical phonons in the ternary phase ZrS 3-xSe x has been investigated by means of Raman spectroscopy through the whole composition range 0 ⩽ x ⩽ 3. A mixed one-, two- and three-mode behaviour is observed, depending respectively on modes of group I (quasi- rigid chain modes), II (internal deformation chain modes) and III (diatomic X-X [ X = S, Se] stretching mode). Three-mode behaviour of diatomic X-X mode is explained in terms of vibrations of S-S, Se-Se and S-Se pairs, practically insensitive to metal atoms as shown by comparison with the HfS 3-xSe x system. The analysis of integrated intensities of peaks assigned to vibrations of S-S, Se-Se and S-Se pairs on the basis of a statistical model concludes in favour of higher Raman efficiency of selenium pairs compared to sulfur pairs. On the other hand, one-mode behaviour of quasi-rigid chain modes establishes unambiguously a one-to-one mode correspondence between the two binary compounds, confirming thus our previous assignments. Spectral features of the ternary phase suggest contributions from the density of vibrational states due to relaxation of Raman selection rules resulting from configurational disorder.

  20. Spin-wave fluctuations in ferrimagnetic MgxFe3-xO4 nanoparticles

    NASA Astrophysics Data System (ADS)

    Franco, A.; Zapf, V. S.; Barbeta, V. B.; Jardim, R. F.

    2010-04-01

    We have performed a systematic study of the magnetic properties of a series of ferrimagnetic nanoparticles of MgxFe3-xO4 (0.8≤x≤1.5) prepared by the combustion reaction method. The magnetization data can be well fitted by Bloch's law with T3/2. Bloch's constant B determined from the fitting procedure was found to increase with Mg content x from ˜3.09×10-5 K-3/2 for x=0.8 to 6.27×10-5 K-3/2 for x=1.5. The exchange integral JAB and the spin-wave stiffness constant D of MgxFe3-xO4 nanoparticles were also determined as ˜0.842 and 0.574 meV and 296 and 202 meV Å2 for specimens with x=0.8 and 1.5, respectively. These results are discussed in terms of cation redistribution among A and B sites on these nanostructured spinel ferrites.

  1. Study on MoO{sub 3-x} films deposited by reactive sputtering for organic light-emitting diodes

    SciTech Connect

    Oka, Nobuto; Watanabe, Hiroki; Sato, Yasushi; Yamaguchi, Hiroshi; Ito, Norihiro; Tsuji, Hiroya; Shigesato, Yuzo

    2010-07-15

    The authors investigate the role of reduced molybdenum trioxide [MoO{sub 3-x} (x{<=}1)] films in organic light-emitting diodes, particularly from the viewpoint of the oxidation state of Mo. MoO{sub 3-x} films were deposited by reactive sputtering under a mixture of argon (Ar) and oxygen (O{sub 2}). The O{sub 2} gas-flow ratio (GFR) [O{sub 2}/(Ar+O{sub 2})] was adjusted between 10% and 100%. Mo with six, five, and four valence electrons was detected in MoO{sub 3-x} film deposited with an O{sub 2} GFR of 10% and 12.5%, whereas, under higher O{sub 2} GFRs, only six valence electrons for Mo in the MoO{sub 3-x} film were detected. N,N{sup '}-di(1-naphthyl)-N,N{sup '}-diphenylbenzidine ({alpha}-NPD) layer, hole-transport material, were deposited over the MoO{sub 3-x} layer by subsequent vacuum evaporation. At the {alpha}-NPD/MoO{sub 3-x} interface, it was found that {alpha}-NPD cations were generated and that MoO{sub 3-x} was reduced, which provided evidence of charge transfer across the interface by Raman spectroscopy and x-ray photoelectron spectroscopy.

  2. Tattoo-pigmented cervical lymph node that masqueraded as the sentinel lymph node in oral squamous cell carcinoma.

    PubMed

    Pinto, Amith; Wieshmann, Hulya; Triantafyllou, Asterios; Shaw, Richard

    2015-11-01

    We describe a case of a pigmented cervical lymph node mimicking the sentinel node during sentinel lymph node biopsy (SLNB) on a patient with oral squamous cell carcinoma (OSCC). The patient had extensive tattoos on his neck. This pigmented lymph node was not identified to be the sentinel lymph node using static and dynamic lymphoscintigraphy. Subsequent histological analysis revealed tattoo pigment within this lymph node. It is important during cervical SLNB to be aware that cutaneous tattoos can pigment lymph nodes. PMID:26188933

  3. [INTRAOPERATIVE DETECTION OF SENTINEL LYMPH NODES USING INFRARED IMAGING SYSTEM IN LOCAL NON-SMALL CELL CARCINOMA OF LUNG].

    PubMed

    Akopov, A L; Papayan, G V; Chistyakov, I V; Karlson, A; Gerasin, A V; Agishev, A S

    2015-01-01

    The article presents the results of the first domestic experience of intraoperative fluorescence mapping of sentinel lymph nodes in lung cancer. The research included 10 patients, who underwent surgery over the period of time from September 2013 to May 2014. After performing thoracotomy, the solution of indocyanine green (ICG) was injected using subpleural position above the tumor in 3-4 points. Fluorescence (ICG) image guided surgery was carried out by using infrared radiation (wave length 808 nm) on lung surface, root of lung, mediastinum in real time. Fluorescence lymph nodes were mapped. In case that metastatic lesions weren't revealed in sentinel lymph nodes, they weren't noted in other nodes. Method specificity consisted of 100%. Biopsy and histological study of sentinel lymph nodes mapped during fluorescence (ICG) image guided surgery could be useful for prevention of lymphodissection in patients with non-small cell carcinoma of lung. PMID:26601511

  4. Alterations in synaptic plasticity coincide with deficits in spatial working memory in presymptomatic 3xTg-AD mice.

    PubMed

    Clark, Jason K; Furgerson, Matthew; Crystal, Jonathon D; Fechheimer, Marcus; Furukawa, Ruth; Wagner, John J

    2015-11-01

    Alzheimer's disease is a neurodegenerative condition believed to be initiated by production of amyloid-beta peptide, which leads to synaptic dysfunction and progressive memory loss. Using a mouse model of Alzheimer's disease (3xTg-AD), an 8-arm radial maze was employed to assess spatial working memory. Unexpectedly, the younger (3month old) 3xTg-AD mice were as impaired in the spatial working memory task as the older (8month old) 3xTg-AD mice when compared with age-matched NonTg control animals. Field potential recordings from the CA1 region of slices prepared from the ventral hippocampus were obtained to assess synaptic transmission and capability for synaptic plasticity. At 3months of age, the NMDA receptor-dependent component of LTP was reduced in 3xTg-AD mice. However, the magnitude of the non-NMDA receptor-dependent component of LTP was concomitantly increased, resulting in a similar amount of total LTP in 3xTg-AD and NonTg mice. At 8months of age, the NMDA receptor-dependent LTP was again reduced in 3xTg-AD mice, but now the non-NMDA receptor-dependent component was decreased as well, resulting in a significantly reduced total amount of LTP in 3xTg-AD compared with NonTg mice. Both 3 and 8month old 3xTg-AD mice exhibited reductions in paired-pulse facilitation and NMDA receptor-dependent LTP that coincided with the deficit in spatial working memory. The early presence of this cognitive impairment and the associated alterations in synaptic plasticity demonstrate that the onset of some behavioral and neurophysiological consequences can occur before the detectable presence of plaques and tangles in the 3xTg-AD mouse model of Alzheimer's disease.

  5. Sentinel node evaluation in gynecologic cancer.

    PubMed

    Plante, Marie; Renaud, Marie-Claude; Roy, Michel

    2004-01-01

    The sentinel node evaluation has revolutionized the modern surgical management of cutaneous melanoma and breast cancer. In gynecologic oncology, sentinel node mapping has been mainly studied in vulvar and cervical cancer. In vulvar cancer, data from 12 studies including 353 cases indicate that the sentinel node detection rate is 92% and the negative-predictive value is 99%. Three groin recurrences have been documented so far (< 1%). The technique has more recently been studied in cervical cancer. Data from 12 studies including 323 cases indicate a lower sentinel node detection rate of 80% to 86% and a negative-predictive value of 99%. Three false-negative cases have been reported so far (< 1%). Review of the literature suggests that the combined approach with blue dye and lymphoscintigraphy is superior to the blue dye alone for sentinel node detection. It also suggests that the sentinel node mapping technique is feasible in vulvar and cervical cancer and that it may become a valuable alternative to the traditional groin and pelvic lymphadenectomy. However, results have not been duplicated in large multi-institutional trials, and the technique should still be performed in the context of clinical trials. Complications of the sentinel node mapping technique are rare and usually benign but physicians should be aware of the serious risk of anaphylactic reaction to the blue dye (1% to 2%). Before this technique becomes a standard approach in the management of gynecologic malignancies, more data will be needed to clarify some of the related controversies.

  6. Transport optimization considering the node aggregation ability

    NASA Astrophysics Data System (ADS)

    Liu, Gang; Li, Lian; Guo, Jiawei; Li, Zheng

    2015-10-01

    Using the theories of complex networks and gravitational field, we study the dynamic routing process under the framework of node gravitational field, define the equation of gravitation of travel path to data package and introduce two parameters α and γ for adjusting the dependences of transmission data on the unblocked degree of node, the transmission capacity of node and the path length. Based on the path's attraction, a gravitational field routing strategy under node connection ability constraint is proposed with considering the affect of node aggregation ability to transport process, and a parameter is used to adjust the control strength of routing process to node aggregation ability. In order to clarify the efficiency of suggested method, we introduce an order parameter η to measure the throughput of the network by the critical value of phase transition from free state to congestion state, and analyze the distribution of betweenness centrality and traffic jam. Simulation results show that, compared with the traditional shortest path routing strategy, our method greatly improve the throughput of a network, balance the network traffic load and most of the network nodes are used efficiently. Moreover, the network throughput is maximized under μ = -1, and the transmission performance of the algorithm is independent of the values of α and γ, which indicate the routing strategy is stable and reliable.

  7. Parallel node placement method by bubble simulation

    NASA Astrophysics Data System (ADS)

    Nie, Yufeng; Zhang, Weiwei; Qi, Nan; Li, Yiqiang

    2014-03-01

    An efficient Parallel Node Placement method by Bubble Simulation (PNPBS), employing METIS-based domain decomposition (DD) for an arbitrary number of processors is introduced. In accordance with the desired nodal density and Newton’s Second Law of Motion, automatic generation of node sets by bubble simulation has been demonstrated in previous work. Since the interaction force between nodes is short-range, for two distant nodes, their positions and velocities can be updated simultaneously and independently during dynamic simulation, which indicates the inherent property of parallelism, it is quite suitable for parallel computing. In this PNPBS method, the METIS-based DD scheme has been investigated for uniform and non-uniform node sets, and dynamic load balancing is obtained by evenly distributing work among the processors. For the nodes near the common interface of two neighboring subdomains, there is no need for special treatment after dynamic simulation. These nodes have good geometrical properties and a smooth density distribution which is desirable in the numerical solution of partial differential equations (PDEs). The results of numerical examples show that quasi linear speedup in the number of processors and high efficiency are achieved.

  8. Inguinal Lymph Node Anthracosis: A Case Report.

    PubMed

    Biguria, Rafael; Soto, Carlos Alberto

    2016-07-01

    Anthracosis is defined as black, dense pigments in tissues, usually carbon deposits. We, as surgeons, have to make decisions during surgery to the best of our knowledge and based on what the literature provides us. We present the case of a 30-year-old female patient who underwent abdominoplasty. During surgery, bilateral inguinal pigmented and enlarged lymph nodes were seen. Biopsy of the nodes was done to rule out any malignancy. The results showed tattoo pigments on all lymph nodes. We present this case as tattoo pigment migration, which has been rarely described. PMID:27536493

  9. Checkpointing for a hybrid computing node

    DOEpatents

    Cher, Chen-Yong

    2016-03-08

    According to an aspect, a method for checkpointing in a hybrid computing node includes executing a task in a processing accelerator of the hybrid computing node. A checkpoint is created in a local memory of the processing accelerator. The checkpoint includes state data to restart execution of the task in the processing accelerator upon a restart operation. Execution of the task is resumed in the processing accelerator after creating the checkpoint. The state data of the checkpoint are transferred from the processing accelerator to a main processor of the hybrid computing node while the processing accelerator is executing the task.

  10. Inguinal Lymph Node Anthracosis: A Case Report

    PubMed Central

    Soto, Carlos Alberto

    2016-01-01

    Summary: Anthracosis is defined as black, dense pigments in tissues, usually carbon deposits. We, as surgeons, have to make decisions during surgery to the best of our knowledge and based on what the literature provides us. We present the case of a 30-year-old female patient who underwent abdominoplasty. During surgery, bilateral inguinal pigmented and enlarged lymph nodes were seen. Biopsy of the nodes was done to rule out any malignancy. The results showed tattoo pigments on all lymph nodes. We present this case as tattoo pigment migration, which has been rarely described. PMID:27536493

  11. Metal-insulator transition in SrTiO(3-x) thin films induced by frozen-out carriers.

    PubMed

    Liu, Z Q; Leusink, D P; Wang, X; Lü, W M; Gopinadhan, K; Annadi, A; Zhao, Y L; Huang, X H; Zeng, S W; Huang, Z; Srivastava, A; Dhar, S; Venkatesan, T; Ariando

    2011-09-30

    We report optical, electrical and magnetotransport properties of oxygen deficient SrTiO(3) (SrTiO(3-x)) thin films fabricated by pulsed laser deposition technique. The oxygen vacancies (O(vac)) in the thin film are expected to be uniform. By comparing its electrical properties to those of bulk SrTiO(3-x), it was found that O(vac) in bulk SrTiO(3-x) is far from uniform over the whole material. The metal-insulator transition (MIT) observed in the SrTiO(3-x) film was found to be induced by the carrier freeze-out effect. The low temperature frozen state can be reexcited by Joule heating, electric and intriguingly magnetic field. PMID:22112172

  12. Increased Hippocampal Excitability in the 3xTgAD Mouse Model for Alzheimer's Disease In Vivo

    PubMed Central

    Davis, Katherine E.; Fox, Sarah; Gigg, John

    2014-01-01

    Mouse Alzheimer's disease (AD) models develop age- and region-specific pathology throughout the hippocampal formation. One recently established pathological correlate is an increase in hippocampal excitability in vivo. Hippocampal pathology also produces episodic memory decline in human AD and we have shown a similar episodic deficit in 3xTg AD model mice aged 3–6 months. Here, we tested whether hippocampal synaptic dysfunction accompanies this cognitive deficit by probing dorsal CA1 and DG synaptic responses in anaesthetized, 4–6 month-old 3xTgAD mice. As our previous reports highlighted a decline in episodic performance in aged control mice, we included aged cohorts for comparison. CA1 and DG responses to low-frequency perforant path stimulation were comparable between 3xTgAD and controls at both age ranges. As expected, DG recordings in controls showed paired-pulse depression; however, paired-pulse facilitation was observed in DG and CA1 of young and old 3xTgAD mice. During stimulus trains both short-latency (presumably monosynaptic: ‘direct’) and long-latency (presumably polysynaptic: ‘re-entrant’) responses were observed. Facilitation of direct responses was modest in 3xTgAD animals. However, re-entrant responses in DG and CA1 of young 3xTgAD mice developed earlier in the stimulus train and with larger amplitude when compared to controls. Old mice showed less DG paired-pulse depression and no evidence for re-entrance. In summary, DG and CA1 responses to low-frequency stimulation in all groups were comparable, suggesting no loss of synaptic connectivity in 3xTgAD mice. However, higher-frequency activation revealed complex change in synaptic excitability in DG and CA1 of 3xTgAD mice. In particular, short-term plasticity in DG and CA1 was facilitated in 3xTgAD mice, most evidently in younger animals. In addition, re-entrance was facilitated in young 3xTgAD mice. Overall, these data suggest that the episodic-like memory deficit in 3xTgAD mice could be

  13. Composition dependence of superconductivity in YBa2(Cu(3-x)Al(x))Oy

    NASA Technical Reports Server (NTRS)

    Bansal, Narottam P.

    1991-01-01

    Eleven different compositions in the system YBa2(Cu(3-x)Al(x))O(y) (x = 0 to 0.3) have been synthesized and characterized by electrical resistivity measurements, powder x-ray diffraction, and scanning electron microscopy. The superconducting transition temperature T sub c (onset) was almost unaffected by the presence of alumina due to its limited solubility in YBa2Cu3O(7-x). However, T sub c(R = 0) gradually decreased, and the resistive tails became longer with increasing Al2O3 concentration. This was probably due to formation of BaAl2O4 and other impurity phases from chemical decomposition of the superconducting phase by reaction with Al2O3.

  14. Composition dependence of superconductivity in YBa2(Cu(3-x)Al(x))O(y)

    NASA Technical Reports Server (NTRS)

    Bansal, N. P.

    1993-01-01

    Eleven different compositions in the system YBa2(Cu(3-x)Al(x))O(y) (x = 0 to 0.3) have been synthesized and characterized by electrical resistivity measurements, powder X-ray diffraction, and scanning electron microscopy. The superconducting transition temperature T sub c (onset) was almost unaffected by the presence of alumina due to its limited solubility in YBa2Cu3O(7-x). However, T sub c(R = 0) gradually decreased, and the resistive tails became longer with increasing Al2O3 concentration. This was probably due to formation of BaAl2O4 and other impurity phases from chemical decomposition of the superconducting phase by reaction with Al2O3.

  15. High perpendicular magnetic anisotropy in D022-Mn3+xGe tetragonal Heusler alloy films

    NASA Astrophysics Data System (ADS)

    Sugihara, A.; Mizukami, S.; Yamada, Y.; Koike, K.; Miyazaki, T.

    2014-03-01

    We prepared D022-Mn3+xGe (-0.67 ≤ x ≤ 0.35) epitaxial thin films on MgO(001) substrates with Cr(001) buffer layers and systematically investigated the dependence of their perpendicular magnetic anisotropy constant, saturation magnetization, coercivity, and tetragonal axial ratio (c/a) on their composition and substrate temperature. Single-phase D022 crystal structures were formed in films with compositions of 0 ≤ x ≤ 0.35, prepared at 400 °C. The D022-Mn3Ge films exhibited perpendicular magnetization with a magnetic squareness close to unity. Performing magnetic torque measurements at an applied field of 140 kOe, we estimated a perpendicular magnetic anisotropy constant of 11.8 ± 0.5 Merg/cm3, the highest and the most reliable value yet reported.

  16. Optimization of a 3x3 focusing array for heavy ion drivers

    SciTech Connect

    Martovetsky, N N; Meinke, R B

    2005-08-08

    A heavy ion driver for inertial fusion will accelerate an array of beams through common induction cores and then direct the beams onto the DT target. An array of quadrupole focusing magnets is used to prevent beam expansion from space charge forces. In the array, the magnet fields from the coils embracing the beams are coupled, which reduces the cost of superconductor and increases the focusing power. The challenges in designing such an array are meeting the strict requirements for the quadrupole field inside the beam pipes and preventing stray fields outside. We report our optimization effort on designing such an array and show that 3 x 3 or larger arrays are feasible and practical to build with flat racetrack coils.

  17. Dark matter from a classically scale-invariant S U (3 )X

    NASA Astrophysics Data System (ADS)

    Karam, Alexandros; Tamvakis, Kyriakos

    2016-09-01

    In this work we study a classically scale-invariant extension of the Standard Model in which the dark matter and electroweak scales are generated through the Coleman-Weinberg mechanism. The extra S U (3 )X gauge factor gets completely broken by the vacuum expectation values of two scalar triplets. Out of the eight resulting massive vector bosons the three lightest are stable due to an intrinsic Z2×Z2' discrete symmetry and can constitute dark matter candidates. We analyze the phenomenological viability of the predicted multi-Higgs sector imposing theoretical and experimental constraints. We perform a comprehensive analysis of the dark matter predictions of the model solving numerically the set of coupled Boltzmann equations involving all relevant dark matter processes and explore the direct detection prospects of the dark matter candidates.

  18. CHF prediction of GE 3 x 3 rod bundle based on BODYFIT-2PE. [BWR

    SciTech Connect

    Chien, T.H.; Chen, B.C.J.; Sha, W.T.; Kim, J.H.

    1983-01-01

    A General Electric 3 x 3 rod bundle critical heat flux (CHF) experiment was analyzed by using BODYFIT-2PE. (Boundary-fitted coordinates-2 phase partially elliptic). BODYFIT-2PE is a three-dimensional, steady-state/transient, single-phase rod-bundle thermal-hydraulic computer program based on the technique of boudnary-fitted coordinate system. In this coordinate system, all the physical boundaries are made to be coincident with the coordinate lines so that the boundary conditions, such as constant heat fluxes and zero velocities, can be accurately represented without interpolation. However, the transformed coordinate system is not unique for a given geometric configuration. The more orthogonal the coordinates are, the faster the rates of calculational convergence. The generation of the transformed coordinates is based on the solution of a set of second-order partial differential equations, subject to a set of geometric boundary conditions. A simple Laplacian is used in the present study.

  19. Improved CD control for 45-40 nm CMOS logic patterning: anticipation for 32-28 nm

    NASA Astrophysics Data System (ADS)

    Le Gratiet, Bertrand; Sundermann, Frank; Massin, Jean; Decaux, Marianne; Thivolle, Nicolas; Baron, Fabrice; Ostrovsky, Alain; Monget, Cedric; Chapon, Jean Damien; Blancquaert, Yoann; Dabertrand, Karen; Thevenon, Lionel; Bry, Benedicte; Cluet, Nicolas; Borot, Bertrand; Bingert, Raphael; Devoivre, Thierry; Gourard, Pascal; Babaud, Laurène; Buttgereit, Ute; Birkner, Robert; Joyner, Mark; Graitzer, Erez; Cohen, Avi

    2010-03-01

    Since 2008, we have been presenting some papers regarding CMOS 45nm logic gate patterning activity to reduce CD dispersion. After a global CD budget evaluation at SPIE08, we have been focusing on Intrafield CD corrections using Dose MapperTM. The story continues and since then we have pursued our intrafield characterisation and focus on ways to get Dose MapperTM dose recipe created before the first silicon is coming. In fact 40nm technology is already more demanding and we must be ready with integrated solutions for 32/28nm node. Global CD budget can be divided in Lot to Lot, Wafer to Wafer, Intra wafer and Intra field component. We won't talk here about run to run solutions which are put in place for Lot to Lot and Wafer to Wafer. We will emphasize on the intrafield / intrawafer process corrections and outline process compensation control and strategy. A lot of papers regarding intrafield CD compensation are available in the litterature but they do not necesserally fit logic manufacturing needs or possibilities. We need to put similar solutions in place which are comprehensive and flexible. How can we correct upfront an Etch chamber CD profile combined with a mask and scanner CD signature? How can we get intrafield map from random logic devices? This is what we will develop in this paper.

  20. Cu3-xP Nanocrystals as a Material Platform for Near-Infrared Plasmonics and Cation Exchange Reactions

    PubMed Central

    2015-01-01

    Synthesis approaches to colloidal Cu3P nanocrystals (NCs) have been recently developed, and their optical absorption features in the near-infrared (NIR) have been interpreted as arising from a localized surface plasmon resonance (LSPR). Our pump–probe measurements on platelet-shaped Cu3-xP NCs corroborate the plasmonic character of this absorption. In accordance with studies on crystal structure analysis of Cu3P dating back to the 1970s, our density functional calculations indicate that this material is substoichiometric in copper, since the energy of formation of Cu vacancies in certain crystallographic sites is negative, that is, they are thermodynamically favored. Also, thermoelectric measurements point to a p-type behavior of the majority carriers from films of Cu3-xP NCs. It is likely that both the LSPR and the p-type character of our Cu3-xP NCs arise from the presence of a large number of Cu vacancies in such NCs. Motivated by the presence of Cu vacancies that facilitate the ion diffusion, we have additionally exploited Cu3-xP NCs as a starting material on which to probe cation exchange reactions. We demonstrate here that Cu3-xP NCs can be easily cation-exchanged to hexagonal wurtzite InP NCs, with preservation of the anion framework (the anion framework in Cu3-xP is very close to that of wurtzite InP). Intermediate steps in this reaction are represented by Cu3-xP/InP heterostructures, as a consequence of the fact that the exchange between Cu+ and In3+ ions starts from the peripheral corners of each NC and gradually evolves toward the center. The feasibility of this transformation makes Cu3-xP NCs an interesting material platform from which to access other metal phosphides by cation exchange. PMID:25960605

  1. Synchronizing compute node time bases in a parallel computer

    DOEpatents

    Chen, Dong; Faraj, Daniel A; Gooding, Thomas M; Heidelberger, Philip

    2015-01-27

    Synchronizing time bases in a parallel computer that includes compute nodes organized for data communications in a tree network, where one compute node is designated as a root, and, for each compute node: calculating data transmission latency from the root to the compute node; configuring a thread as a pulse waiter; initializing a wakeup unit; and performing a local barrier operation; upon each node completing the local barrier operation, entering, by all compute nodes, a global barrier operation; upon all nodes entering the global barrier operation, sending, to all the compute nodes, a pulse signal; and for each compute node upon receiving the pulse signal: waking, by the wakeup unit, the pulse waiter; setting a time base for the compute node equal to the data transmission latency between the root node and the compute node; and exiting the global barrier operation.

  2. Synchronizing compute node time bases in a parallel computer

    DOEpatents

    Chen, Dong; Faraj, Daniel A; Gooding, Thomas M; Heidelberger, Philip

    2014-12-30

    Synchronizing time bases in a parallel computer that includes compute nodes organized for data communications in a tree network, where one compute node is designated as a root, and, for each compute node: calculating data transmission latency from the root to the compute node; configuring a thread as a pulse waiter; initializing a wakeup unit; and performing a local barrier operation; upon each node completing the local barrier operation, entering, by all compute nodes, a global barrier operation; upon all nodes entering the global barrier operation, sending, to all the compute nodes, a pulse signal; and for each compute node upon receiving the pulse signal: waking, by the wakeup unit, the pulse waiter; setting a time base for the compute node equal to the data transmission latency between the root node and the compute node; and exiting the global barrier operation.

  3. Raman scattering in the ternary phase HfS3-xSex

    NASA Astrophysics Data System (ADS)

    Zwick, A.; Landa, G.; Renucci, M. A.; Carles, R.; Kjekshus, A.

    1982-11-01

    The mode behavior of long-wavelength optical phonons in the ternary phase HfS3-xSex has been investigated by Raman spectroscopy through the whole composition range 0<=x<=3. Previous studies on the parent compounds have shown that k-->=0--> Raman-active modes can be classified according to largely rigid chain modes (group I), internal deformation chain modes (group II), and a stretching mode of the diatomic chalcogen X2 pair within the chains (group III). A mixed one-, two-, and three-mode behavior is observed in the HfS3-xSex system, depending respectively on modes of group I, II, and III. This behavior reflects the quite different and specific atomic interactions governing these different groups. More precisely, the mode-number progression from group I to group III appears to be related to the corresponding shortening of the range of atomic interactions involved. In particular, three-mode behavior is observed for diatomic X2 modes. This behavior results from vibrations of S-S, Se-Se, and S-Se pairs of chalcogen atoms covalently bound. The picture of diatomic X-X' (X, X'=S, Se) "molecules" is substantiated by an estimate of the S-Se mode frequency based on a molecular model, in good agreement with experimental data. In addition, we took advantage of one-mode behavior of group I to establish a one-to-one correspondence between compatible phonons in the pure end member crystals and thus resolve some discrepancies in mode assignment from different authors.

  4. Magneto-transport behaviour of Bi2Se3-xTex : role of disorder.

    PubMed

    Amaladass, E P; Devidas, T R; Sharma, Shilpam; Sundar, C S; Mani, Awadhesh; Bharathi, A

    2016-02-24

    Magneto-resistance and Hall resistance measurements have been carried out in fast-cooled single crystals of Bi2Se3-xTex (x  =  0 to 2) in 4-300 K temperature range, under magnetic fields up to 15 T. The variation of resistivity with temperature that points to a metallic behaviour in Bi2Se3, shows an up-turn at low temperatures in the Te doped samples. Magneto-resistance measurements in Bi2Se3 show clear signatures of Shubnikov-de Hass (SdH) oscillations that gets suppressed in the Te doped samples. In the Bi2SeTe2 sample, the magneto-resistance shows a cusp like positive magneto-resistance at low magnetic fields and low temperatures, a feature associated with weak anti-localisation (WAL), that crosses over to negative magneto-resistance at higher fields. The qualitatively different magneto-transport behaviour seen in Bi2SeTe2 as compared to Bi2Se3 is rationalised in terms of the disorder, through an estimate of the carrier density, carrier mobility and an analysis in terms of the Ioffe-Regel criterion with support from Hall Effect measurements. We demonstrate that by introducing Te, in the strongly disordered samples a smooth crossover of SdH and WAL can be seen in the Bi2Se3-xTex series, both of which provide signatures for the presence of topological surface states. PMID:26812889

  5. Percutaneous Vertebroplasty in Painful Schmorl Nodes

    SciTech Connect

    Masala, Salvatore Pipitone, Vincenzo; Tomassini, Marco; Massari, Francesco; Romagnoli, Andrea; Simonetti, Giovanni

    2006-02-15

    The Schmorl node represents displacement of intervertebral disc tissue into the vertebral body. Both Schmorl nodes and degenerative disc disease are common in the human spine. We performed a retrospective study, for the period from January 2003 to February 2005, evaluating 23 patients affected by painful Schmorl nodes, who underwent in our department percutaneous transpedicular injection of polymethylmethacrylate (vertebroplasty) in order to solve their back pain not responsive to medical and physical management. Eighteen patients reported improvement of the back pain and no one reported a worsening of symptoms. Improvement was swift and persistent in reducing symptoms. Painful Schmorl nodes, refractory to medical or physical therapy, should be considered as a new indication within those vertebral lesions adequately treatable utilizing Vertebroplasty procedure.

  6. Mesenteric lymph node cavitation in coeliac disease.

    PubMed Central

    Holmes, G K

    1986-01-01

    A patient with coeliac disease and mesenteric lymph node cavitation is reported. This is a rare occurrence and has received very little attention in the English literature. Images Fig. 1 Fig. 2 Fig. 3 Fig. 4 Fig. 5 PMID:3721297

  7. Earth transportation node requirements and design

    NASA Technical Reports Server (NTRS)

    Hook, W. Ray; Ayers, J. Kirk; Cirillo, William M.

    1988-01-01

    The objective of this paper is to establish the requirements for an inhabited earth orbiting transportation node and to develop design concepts for such a facility. The use of an earth orbiting transportation node is required to support many of the space flight projects proposed for the beginning of the 21st century. The requirements for such an orbiting facility are derived from the missions which they support. Future missions investigated include automated and human exploration of the solar system, support of a lunar base, and missions to planet earth. Design concepts are presented for transportation nodes based on a variation of the current Space Station Freedom design. Designs accommodate a variety of earth-to-orbit, orbit-to-orbit, and deep-space probe transportation systems. Finally, the technology needed to develop such a transportation node is summarized.

  8. International Lunar Network (ILN) Anchor Nodes

    NASA Technical Reports Server (NTRS)

    Cohen, Barbara A.

    2008-01-01

    This slide presentation reviews what we know about the interior and surface of the moon and the need to establish a robotic set of geophysical monitoring stations on the surface of the Moon for the purpose of providing significant scientific value to the exploration of the Moon. The ILN Anchor Nodes will provide the backbone of the network in a way that accomplishes new science and allows other nodes to be flexible contributors to the network.

  9. Age-dependent impairment of glucose tolerance in the 3xTg-AD mouse model of Alzheimer's disease.

    PubMed

    Vandal, Milene; White, Phillip J; Chevrier, Geneviève; Tremblay, Cyntia; St-Amour, Isabelle; Planel, Emmanuel; Marette, Andre; Calon, Frederic

    2015-10-01

    Alzheimer's disease (AD) has been associated with type II diabetes (T2D) and obesity in several epidemiologic studies. To determine whether AD neuropathology can cause peripheral metabolic impairments, we investigated metabolic parameters in the triple-transgenic (3xTg)-AD mouse model of AD, compared with those in nontransgenic (non-Tg) controls, at 6, 8, and 14 mo of age. We found a more pronounced cortical Aβ accumulation (2- and 3.5-fold increase in Aβ42 in the soluble and insoluble protein fractions, respectively) in female 3xTg-AD mice than in the males. Furthermore, female 3xTg-AD mice displayed a significant deterioration in glucose tolerance (AUC, +118% vs. non-Tg mice at 14 mo). Fasting plasma insulin levels rose 2.5-fold from 6 to 14 mo of age in female 3xTg-AD mice. Glucose intolerance and cortical amyloid pathology worsened with age, and both were more pronounced in the females. Pancreatic amyloidopathy was revealed and could underlie the observed deficit in glycemic response in 3xTg-AD mice. The present results suggest that AD-like neuropathology extends to the pancreas in the 3xTg-AD mouse, leading to glucose intolerance and contributing to a pathologic self-amplifying loop between AD and T2D. PMID:26108977

  10. Evolutionary constraints acting on DDX3X protein potentially interferes with Rev-mediated nuclear export of HIV-1 RNA.

    PubMed

    Sharma, Deepak; Bhattacharya, Jayanta

    2010-01-01

    Differential host-pathogen interactions direct viral replication in infected cells. In HIV-1 infected cells, nuclear export of viral RNA transcripts into cellular cytoplasm is governed by interaction of HIV-1 Rev, Exportin-1 (CRM-1) and DDX3X. Knock down of DDX3X has been shown to drastically impair HIV replication. Here we show that evolutionary forces are responsible for demarking previously unidentified critical functionally important residues on the surface of DDX3X. Using computational approaches, we show that these functional residues, depending on their location, are capable of regulating ATPase and RNA helicase functions of DDX3X. The potential of these residues in designing better blockers against HIV-1 replication was also assessed. Also, using stepwise docking simulations, we could identify DDX3X-CRM-1 interface and its critical functional residues. Our data would help explain the role of DDX3X in HIV-1 Rev function with potential to design new intervention strategies against HIV-1 replication.

  11. [Regional lymph nodes at a distance].

    PubMed

    Kroon, B B R; Hoefnagel, C A; Valdés Olmos, R A; Nieweg, O E

    2008-09-13

    In 3 patients, two men aged 22 years and 38 years with melanoma, and one woman aged 46 years with breast cancer, local tumour growth recurred following regional lymph node dissection. All three developed metastasis in new distant regional basins, which were once more dissected. The first melanoma patient died from haematogenous metastasis, 2 years after the excision of his primary melanoma. The other melanoma patient was alive, without evidence of disease, 8 years after the treatment of his primary tumour. The breast cancer patient, who underwent contralateral axillary lymph node dissection, was also alive, without evidence of disease, 27 years after the treatment of her primary tumour. Diversion of lymphatic flow as a result of regional lymph node dissection for cancer may lead to metastasis to a distant lymph node basin if tumour growth recurs in the original area. Knowledge of this usually unknown phenomenon is important since metastasis to these new regional basins can still be treated curatively, in the form of another lymph node dissection. These distant lymph node basins must therefore be carefully checked during follow-up monitoring.

  12. Cervical lymph node diseases in children

    PubMed Central

    Lang, Stephan; Kansy, Benjamin

    2014-01-01

    The lymph nodes are an essential part of the body’s immune system and as such are affected in many infectious, autoimmune, metabolic and malignant diseases. The cervical lymph nodes are particularly important because they are the first drainage stations for key points of contact with the outside world (mouth/throat/nose/eyes/ears/respiratory system) – a critical aspect especially among children – and can represent an early clinical sign in their exposed position on a child’s slim neck. Involvement of the lymph nodes in multiple conditions is accompanied by a correspondingly large number of available diagnostic procedures. In the interests of time, patient wellbeing and cost, a careful choice of these must be made to permit appropriate treatment. The basis of diagnostic decisions is a detailed anamnesis and clinical examination. Sonography also plays an important role in differential diagnosis of lymph node swelling in children and is useful in answering one of the critical diagnostic questions: is there a suspicion of malignancy? If so, full dissection of the most conspicuous lymph node may be necessary to obtain histological confirmation. Diagnosis and treatment of childhood cervical lymph node disorders present the attending pediatric and ENT physicians with some particular challenges. The spectrum of differential diagnoses and the varying degrees of clinical relevance – from banal infections to malignant diseases – demand a clear and considered approach to the child’s individual clinical presentation. Such an approach is described in the following paper. PMID:25587368

  13. [Regional lymph nodes at a distance].

    PubMed

    Kroon, B B R; Hoefnagel, C A; Valdés Olmos, R A; Nieweg, O E

    2008-09-13

    In 3 patients, two men aged 22 years and 38 years with melanoma, and one woman aged 46 years with breast cancer, local tumour growth recurred following regional lymph node dissection. All three developed metastasis in new distant regional basins, which were once more dissected. The first melanoma patient died from haematogenous metastasis, 2 years after the excision of his primary melanoma. The other melanoma patient was alive, without evidence of disease, 8 years after the treatment of his primary tumour. The breast cancer patient, who underwent contralateral axillary lymph node dissection, was also alive, without evidence of disease, 27 years after the treatment of her primary tumour. Diversion of lymphatic flow as a result of regional lymph node dissection for cancer may lead to metastasis to a distant lymph node basin if tumour growth recurs in the original area. Knowledge of this usually unknown phenomenon is important since metastasis to these new regional basins can still be treated curatively, in the form of another lymph node dissection. These distant lymph node basins must therefore be carefully checked during follow-up monitoring. PMID:18825884

  14. Layout dependent effects analysis on 28nm process

    NASA Astrophysics Data System (ADS)

    Li, Helen; Zhang, Mealie; Wong, Waisum; Song, Huiyuan; Xu, Wei; Hurat, Philippe; Ding, Hua; Zhang, Yifan; Cote, Michel; Huang, Jason; Lai, Ya-ch

    2015-03-01

    Advanced process nodes introduce new variability effects due to increased density, new material, new device structures, and so forth. This creates more and stronger Layout Dependent effects (LDE), especially below 28nm. These effects such as WPE (Well Proximity Effect), PSE (Poly Spacing Effect) change the carrier mobility and threshold voltage and therefore make the device performances, such as Vth and Idsat, extremely layout dependent. In traditional flows, the impact of these changes can only be simulated after the block has been fully laid out, the design is LVS and DRC clean. It's too late in the design cycle and it increases the number of post-layout iteration. We collaborated to develop a method on an advanced process to embed several LDE sources into a LDE kit. We integrated this LDE kit in custom analog design environment, for LDE analysis at early design stage. These features allow circuit and layout designers to detect the variations caused by LDE, and to fix the weak points caused by LDE. In this paper, we will present this method and how it accelerates design convergence of advanced node custom analog designs by detecting early-on LDE hotspots on partial or fully placed layout, reporting contribution of each LDE component to help identify the root cause of LDE variation, and even providing fixing guidelines on how to modify the layout and to reduce the LDE impact.

  15. Signaling completion of a message transfer from an origin compute node to a target compute node

    DOEpatents

    Blocksome, Michael A.; Parker, Jeffrey J.

    2011-05-24

    Signaling completion of a message transfer from an origin node to a target node includes: sending, by an origin DMA engine, an RTS message, the RTS message specifying an application message for transfer to the target node from the origin node; receiving, by the origin DMA engine, a remote get message containing a data descriptor for the message and a completion notification descriptor, the completion notification descriptor specifying a local direct put transfer operation for transferring data locally on the origin node; inserting, by the origin DMA engine in an injection FIFO buffer, the data descriptor followed by the completion notification descriptor; transferring, by the origin DMA engine to the target node, the message in dependence upon the data descriptor; and notifying, by the origin DMA engine, the application that transfer of the message is complete in dependence upon the completion notification descriptor.

  16. Signaling completion of a message transfer from an origin compute node to a target compute node

    DOEpatents

    Blocksome, Michael A.

    2011-02-15

    Signaling completion of a message transfer from an origin node to a target node includes: sending, by an origin DMA engine, an RTS message, the RTS message specifying an application message for transfer to the target node from the origin node; receiving, by the origin DMA engine, a remote get message containing a data descriptor for the message and a completion notification descriptor, the completion notification descriptor specifying a local memory FIFO data transfer operation for transferring data locally on the origin node; inserting, by the origin DMA engine in an injection FIFO buffer, the data descriptor followed by the completion notification descriptor; transferring, by the origin DMA engine to the target node, the message in dependence upon the data descriptor; and notifying, by the origin DMA engine, the application that transfer of the message is complete in dependence upon the completion notification descriptor.

  17. Dynamically reassigning a connected node to a block of compute nodes for re-launching a failed job

    SciTech Connect

    Budnik, Thomas A.; Knudson, Brant L.; Megerian, Mark G.; Miller, Samuel J.; Stockdell, William M.

    2012-03-20

    Methods, systems, and products for dynamically reassigning a connected node to a block of compute nodes for re-launching a failed job that include: identifying that a job failed to execute on the block of compute nodes because connectivity failed between a compute node assigned as at least one of the connected nodes for the block of compute nodes and its supporting I/O node; and re-launching the job, including selecting an alternative connected node that is actively coupled for data communications with an active I/O node; and assigning the alternative connected node as the connected node for the block of compute nodes running the re-launched job.

  18. Role of dynamic sentinel node biopsy in carcinoma penis with or without palpable nodes

    PubMed Central

    Kathiresan, N.; Raja, Anand; Ramachandran, Krishna Kumar; Sundersingh, Shirley

    2016-01-01

    Introduction: We aimed to evaluate the role of dynamic sentinel node biopsy (DSLNB) in patients diagnosed with carcinoma penis and clinically N0 disease using superficial inguinal dissection as the standard staging modality. Materials and Methods: Twenty consecutive men (40 groins) with carcinoma penis having clinically N0 status were enrolled in the study. Patients underwent DSLNB if fine needle aspiration cytology from the groin nodes was negative, followed by injection of radiocolloid and blue dye. The sentinel lymph node(s) were harvested. The inguinal incision was then extended and a modified superficial inguinal dissection was performed and all nodes were labeled separately and sent for frozen section. A completion deep inguinal with pelvic dissection was performed if any of the nodes were reported positive for malignancy. Results: The median age of the patients was 52.5 years. Ten patients were smokers. Phimosis was present in five patients. Lesions were present over the glans penis and shaft in 18 and two patients, respectively. Wide local excision, partial penectomy and total penectomy were performed in one, 15 and four patients, respectively. Clinically palpable nodes were found in 19 groins. Median follow-up was 26 months. Nodes were positive in 10 groins. DSLNB missed the sentinel node in one groin. The accuracy and false-negative rate of DSLNB was 97.5% and 10%, respectively. Conclusion: DSLNB is a useful and reliable technique to identify the involved node(s) in patients diagnosed as having carcinoma penis with clinical N0 status (with or without palpable nodes). It helps to avoid the morbidity associated with a staging inguinal dissection in these patients. PMID:26941496

  19. 32 nm logic patterning options with immersion lithography

    NASA Astrophysics Data System (ADS)

    Lai, K.; Burns, S.; Halle, S.; Zhuang, L.; Colburn, M.; Allen, S.; Babcock, C.; Baum, Z.; Burkhardt, M.; Dai, V.; Dunn, D.; Geiss, E.; Haffner, H.; Han, G.; Lawson, P.; Mansfield, S.; Meiring, J.; Morgenfeld, B.; Tabery, C.; Zou, Y.; Sarma, C.; Tsou, L.; Yan, W.; Zhuang, H.; Gil, D.; Medeiros, D.

    2008-03-01

    The semiconductor industry faces a lithographic scaling limit as the industry completes the transition to 1.35 NA immersion lithography. Both high-index immersion lithography and EUV lithography are facing technical challenges and commercial timing issues. Consequently, the industry has focused on enabling double patterning technology (DPT) as a means to circumvent the limitations of Rayleigh scaling. Here, the IBM development alliance demonstrate a series of double patterning solutions that enable scaling of logic constructs by decoupling the pattern spatially through mask design or temporally through innovative processes. These techniques have been successfully employed for early 32nm node development using 45nm generation tooling. Four different double patterning techniques were implemented. The first process illustrates local RET optimization through the use of a split reticle design. In this approach, a layout is decomposed into a series of regions with similar imaging properties and the illumination conditions for each are independently optimized. These regions are then printed separately into the same resist film in a multiple exposure process. The result is a singly developed pattern that could not be printed with a single illumination-mask combination. The second approach addresses 2D imaging with particular focus on both line-end dimension and linewidth control [1]. A double exposure-double etch (DE2) approach is used in conjunction with a pitch-filling sacrificial feature strategy. The third double exposure process, optimized for via patterns also utilizes DE2. In this method, a design is split between two separate masks such that the minimum pitch between any two vias is larger than the minimum metal pitch. This allows for final structures with vias at pitches beyond the capability of a single exposure. In the fourth method,, dark field double dipole lithography (DDL) has been successfully applied to BEOL metal structures and has been shown to be

  20. Lymph node revealing solution: a new method for lymph node sampling: results in gastric adenocarcinoma.

    PubMed

    Koren, R; Kyzer, S; Levin, I; Klein, B; Halpern, M; Rath-Wolfson, L; Paz, A; Melloul, M M; Mishali, M; Gal, R

    1998-01-01

    Staging of gastric carcinoma depends on exact lymph node status. However, very small nodes are not easily found as they are obscured by the surrounding adipose tissue. The purpose of the present study was to demonstrate the usefulness of a Olymph node revealing solutionO (LNRS) in gastric cancer. The perigastric adipose tissue of ten OproblematicO cases of gastric carcinoma, in which <10 lymph nodes were found using the traditional method, was immersed in LNRS for 6-12 h. Subsequently, the lymph nodes stood out as white chalky nodules. They were excised and processed routinely. The traditional method yielded a total of 30 lymph nodes with a mean size of 6.69 +/- 3.43 mm. The LNRS revealed 89 additional nodes with a mean size of 3.03 +/- 3.43 mm, which was significantly smaller. The Node (N) stage was changed in four cases from Nx to N0, in one case from N1 to N2, and in one case from N0 to N2. LNRS seems to be the technique of choice for staging of patients with gastric adenocarcinoma in whom <10 lymph nodes were found with the traditional method and accurate staging was not possible. PMID:9468553

  1. Fast Anion-Exchange in Highly Luminescent Nanocrystals of Cesium Lead Halide Perovskites (CsPbX3, X = Cl, Br, I)

    PubMed Central

    2015-01-01

    Postsynthetic chemical transformations of colloidal nanocrystals, such as ion-exchange reactions, provide an avenue to compositional fine-tuning or to otherwise inaccessible materials and morphologies. While cation-exchange is facile and commonplace, anion-exchange reactions have not received substantial deployment. Here we report fast, low-temperature, deliberately partial, or complete anion-exchange in highly luminescent semiconductor nanocrystals of cesium lead halide perovskites (CsPbX3, X = Cl, Br, I). By adjusting the halide ratios in the colloidal nanocrystal solution, the bright photoluminescence can be tuned over the entire visible spectral region (410–700 nm) while maintaining high quantum yields of 20–80% and narrow emission line widths of 10–40 nm (from blue to red). Furthermore, fast internanocrystal anion-exchange is demonstrated, leading to uniform CsPb(Cl/Br)3 or CsPb(Br/I)3 compositions simply by mixing CsPbCl3, CsPbBr3, and CsPbI3 nanocrystals in appropriate ratios. PMID:26207728

  2. Fast Anion-Exchange in Highly Luminescent Nanocrystals of Cesium Lead Halide Perovskites (CsPbX3, X = Cl, Br, I).

    PubMed

    Nedelcu, Georgian; Protesescu, Loredana; Yakunin, Sergii; Bodnarchuk, Maryna I; Grotevent, Matthias J; Kovalenko, Maksym V

    2015-08-12

    Postsynthetic chemical transformations of colloidal nanocrystals, such as ion-exchange reactions, provide an avenue to compositional fine-tuning or to otherwise inaccessible materials and morphologies. While cation-exchange is facile and commonplace, anion-exchange reactions have not received substantial deployment. Here we report fast, low-temperature, deliberately partial, or complete anion-exchange in highly luminescent semiconductor nanocrystals of cesium lead halide perovskites (CsPbX3, X = Cl, Br, I). By adjusting the halide ratios in the colloidal nanocrystal solution, the bright photoluminescence can be tuned over the entire visible spectral region (410-700 nm) while maintaining high quantum yields of 20-80% and narrow emission line widths of 10-40 nm (from blue to red). Furthermore, fast internanocrystal anion-exchange is demonstrated, leading to uniform CsPb(Cl/Br)3 or CsPb(Br/I)3 compositions simply by mixing CsPbCl3, CsPbBr3, and CsPbI3 nanocrystals in appropriate ratios. PMID:26207728

  3. Synthesis of aqueous ferrofluids of ZnxFe3-xO4 nanoparticles by citric acid assisted hydrothermal-reduction route for magnetic hyperthermia applications

    NASA Astrophysics Data System (ADS)

    Behdadfar, Behshid; Kermanpur, Ahmad; Sadeghi-Aliabadi, Hojjat; Morales, Maria del Puerto; Mozaffari, Morteza

    2012-07-01

    Superparamagnetic and monodispersed aqueous ferrofluids of Zn substituted magnetite nanoparticles (ZnxFe3-xO4, x=0, 0.25, 0.3, 0.37 and 0.4) were synthesized via hydrothermal-reduction route in the presence of citric acid, which is a facile, low energy and environmental friendly method. The synthesized nanoparticles were characterized by X ray diffraction (XRD) analysis, Fourier transform infrared (FTIR) spectroscopy, scanning and transmission electron microscopy (SEM and TEM) and the dynamic light scattering (DLS) method. The results showed that a certain amount of citric acid was required to obtain single phase Zn substituted magnetite nanoparticles. Citric acid acted as a modulator and reducing agent in the formation of spinel structure and controlled nanoparticle size and crystallinity. Mean particle sizes of the prepared nanoparticles were around 10 nm. The results that are obtained from XRD, magnetic and power loss measurements showed that the crystallinity, saturation magnetization (MS) and loss power of the synthesized ferrofluids were all influenced by the substitution of Zn in the structure of magnetite. The Zn substituted magnetite nanoparticles obtained by this route showed a good stability in aqueous medium (pH 7) and hydrodynamic sizes below 100 nm and polydispersity indexes below 0.2. The calculated intrinsic loss power (ILP) for the sample x=0.3 (e.g. 2.36 nH m2/kg) was comparable to ILP of commercial ferrofluids with similar hydrodynamic sizes.

  4. Raman spectroscopy as a tool for the identification and differentiation of neoplasias contained within lymph nodes of the head and neck

    NASA Astrophysics Data System (ADS)

    Orr, Linda E.; Christie-Brown, Jonathan; Hutchings, Joanne C.; McCarthy, Keith; Rose, Simon; Thomas, Michael; Stone, Nicholas

    2010-02-01

    The use of Raman spectroscopy in the detection and classification of malignancy within lymph nodes of the head and neck has been evaluated. Currently histopathology is considered the diagnostic gold standard. A consensus (majority) opinion from three expert histopathologists has been obtained and spectral diagnostic models developed by correlation with their opinions. Raman spectra have been measured at 830nm from 103 lymph nodes collected from patients undergoing surgery for a suspicious node. The pathologies covered reactive lymph nodes, primaries from Hodgkin's and non-Hodgkin's lymphomas and metastases from squamous cell carcinomas and adenocarcinomas. Spectral diagnostic models were constructed using PCA-fed-LDA and tested using leave-one-specimen-out cross validation. Models were constructed to distinguish between reactive and malignant nodes as well as a four group model to distinguish between the benign, metastatic and primary conditions. They achieved 89% and 84% correct prediction by node versus the gold standard, majority histopathology.

  5. Processing and characterization of zeta-Ta4C 3-x: A high toughness tantalum carbide

    NASA Astrophysics Data System (ADS)

    Sygnatowicz, Michael M.

    Tantalum carbides are commonly processed by hot-pressing, canned hot-isostatic-pressing, or spark-plasma sintering because of their high melting temperatures and low diffusivities. This study reports processing of dense ζ-Ta4C 3-x by reaction sintering of a Ta and TaC powder mixture (C/Ta atomic ratio = 0.66). ζ-Ta4C3-x is of interest due to its rhombohedral (trigonal) crystal structure that may be characterized as a polytype with both face-centered-cubic (fcc) and hexagonal-close-packed (hcp) Ta stacking sequences interrupted by stacking faults and missing carbon layers. This structure leads to easy cleaving on the basal planes and high fracture toughness. A key step in processing is the hydrogenation of the Ta powder to produce beta-TaH x, a hard and brittle phase that enables efficient comminution during milling and production of small, equiaxed Ta particles that can be packed to high green density with the TaC powder. Studies of phase evolution by quantitative X-ray diffraction during sintering revealed several intermediate reactions: (a) decomposition of beta-TaHx to Ta, (b) diffusion of C from gamma-TaC to Ta leading to the formation of α-Ta2Cy' with the kinetics described by the Johnson-Mehl-Avrami-Kolmogorov (JMAK) equation with an exponent, n = 0.5, and an activation energy of 221 kJ/mole, (c) equilibration of α-Ta2Cy' and gamma-TaC 0.78 phases, and (d) formation of ζ-Ta4C2.56 from the equilibrated α-Ta2C and gamma-TaC0.78 phases with the kinetics characterized by a higher JMAK exponent ( n ≈ 3) and higher activation energy (1089 kJ/mole). The microstructure showed evidence of nucleation and growth of the ζ-Ta4C 2.56 phase in both the α-Ta2C and gamma-TaC0.78 parent phases with distinct difference in the morphology due to the different number of variants of the habit plane. A hot-pressed and hot-isostatic-pressed (HIPed) material (C/Ta atomic ratio = 0.66), having formed 95 w% ζ-phase, attained a fracture toughness of 15.6 +/- 0.5 MPa√m and a

  6. Stochastic effects in 11 nm imaging of extreme ultraviolet lithography with chemically amplified resists

    NASA Astrophysics Data System (ADS)

    Kozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro

    2014-03-01

    The resolution of extreme ultraviolet (EUV) lithography with chemically amplified resist processes has reached 16 nm (half-pitch). The development of chemically amplified resists is ongoing toward the 11 nm node. However, the stochastic effects are increasingly becoming a significant concern with the continuing shrinkage of features. In this study, the fluctuation of protected unit distribution caused by the stochastic effects during image formation was investigated assuming line-and-space patterns with 11 nm half-pitch. Contrary to expectations, the standard deviation of the number of protected units connected to a polymer after postexposure baking (PEB) did not differ from that for 16 nm half-pitch. The standard deviation after PEB increased with the effective reaction radius for deprotection and the initial standard deviation before PEB. Because of the severe requirements for resist processes, the stochastic effects in chemical reactions should be taken into account in the design of next-generation resists.

  7. Inline detection of Chrome degradation on binary 193nm photomasks

    NASA Astrophysics Data System (ADS)

    Dufaye, Félix; Sippel, Astrid; Wylie, Mark; García-Berríos, Edgardo; Crawford, Charles; Hess, Carl; Sartelli, Luca; Pogliani, Carlo; Miyashita, Hiroyuki; Gough, Stuart; Sundermann, Frank; Brochard, Christophe

    2013-09-01

    193nm binary photomasks are still used in the semiconductor industry for the lithography of some critical layers for the nodes 90nm and 65nm, with high volumes and over long periods. However, these 193nm binary photomasks can be impacted by a phenomenon of chrome oxidation leading to critical dimensions uniformity (CDU) degradation with a pronounced radial signature. If not detected early enough, this CDU degradation may cause defectivity issues and lower yield on wafers. Fortunately, a standard cleaning and repellicle service at the mask shop has been demonstrated as efficient to remove the grown materials and get the photomask CD back on target.Some detection methods have been already described in literature, such as wafer CD intrafield monitoring (ACLV), giving reliable results but also consuming additional SEM time with less precision than direct photomask measurement. In this paper, we propose another approach, by monitoring the CDU directly on the photomask, concurrently with defect inspection for regular requalification to production for wafer fabs. For this study, we focused on a Metal layer in a 90nm technology node. Wafers have been exposed with production conditions and then measured by SEM-CD. Afterwards, this photomask has been measured with a SEM-CD in mask shop and also inspected on a KLA-Tencor X5.2 inspection system, with pixels 125 and 90nm, to evaluate the Intensity based Critical Dimension Uniformity (iCDU) option. iCDU was firstly developed to provide feed-forward CDU maps for scanner intrafield corrections, from arrayed dense structures on memory photomasks. Due to layout complexity and differing feature types, CDU monitoring on logic photomasks used to pose unique challenges.The selection of suitable feature types for CDU monitoring on logic photomasks is no longer an issue, since the transmitted intensity map gives all the needed information, as shown in this paper. In this study, the photomask was heavily degraded after more than 18,000 300

  8. In vivo carbon nanotube-enhanced non-invasive photoacoustic mapping of the sentinel lymph node

    NASA Astrophysics Data System (ADS)

    Pramanik, Manojit; Song, Kwang Hyun; Swierczewska, Magdalena; Green, Danielle; Sitharaman, Balaji; Wang, Lihong V.

    2009-06-01

    Sentinel lymph node biopsy (SLNB), a less invasive alternative to axillary lymph node dissection (ALND), has become the standard of care for patients with clinically node-negative breast cancer. In SLNB, lymphatic mapping with radio-labeled sulfur colloid and/or blue dye helps identify the sentinel lymph node (SLN), which is most likely to contain metastatic breast cancer. Even though SLNB, using both methylene blue and radioactive tracers, has a high identification rate, it still relies on an invasive surgical procedure, with associated morbidity. In this study, we have demonstrated a non-invasive single-walled carbon nanotube (SWNT)-enhanced photoacoustic (PA) identification of SLN in a rat model. We have successfully imaged the SLN in vivo by PA imaging (793 nm laser source, 5 MHz ultrasonic detector) with high contrast-to-noise ratio (=89) and good resolution (~500 µm). The SWNTs also show a wideband optical absorption, generating PA signals over an excitation wavelength range of 740-820 nm. Thus, by varying the incident light wavelength to the near infrared region, where biological tissues (hemoglobin, tissue pigments, lipids and water) show low light absorption, the imaging depth is maximized. In the future, functionalization of the SWNTs with targeting groups should allow the molecular imaging of breast cancer.

  9. Portable widefield imaging device for ICG-detection of the sentinel lymph node

    NASA Astrophysics Data System (ADS)

    Govone, Angelo Biasi; Gómez-García, Pablo Aurelio; Carvalho, André Lopes; Capuzzo, Renato de Castro; Magalhães, Daniel Varela; Kurachi, Cristina

    2015-06-01

    Metastasis is one of the major cancer complications, since the malignant cells detach from the primary tumor and reaches other organs or tissues. The sentinel lymph node (SLN) is the first lymphatic structure to be affected by the malignant cells, but its location is still a great challenge for the medical team. This occurs due to the fact that the lymph nodes are located between the muscle fibers, making it visualization difficult. Seeking to aid the surgeon in the detection of the SLN, the present study aims to develop a widefield fluorescence imaging device using the indocyanine green as fluorescence marker. The system is basically composed of a 780nm illumination unit, optical components for 810nm fluorescence detection, two CCD cameras, a laptop, and dedicated software. The illumination unit has 16 diode lasers. A dichroic mirror and bandpass filters select and deliver the excitation light to the interrogated tissue, and select and deliver the fluorescence light to the camera. One camera is responsible for the acquisition of visible light and the other one for the acquisition of the ICG fluorescence. The software developed at the LabVIEW® platform generates a real time merged image where it is possible to observe the fluorescence spots, related to the lymph nodes, superimposed at the image under white light. The system was tested in a mice model, and a first patient with tongue cancer was imaged. Both results showed the potential use of the presented fluorescence imaging system assembled for sentinel lymph node detection.

  10. Lipid-Calcium Phosphate Nanoparticles for Delivery to the Lymphatic System and SPECT/CT Imaging of Lymph Node Metastases

    PubMed Central

    Tseng, Yu-Cheng; Xu, Zhenghong; Guley, Kevin; Yuan, Hong; Huang, Leaf

    2014-01-01

    A lipid/calcium/phosphate (LCP) nanoparticle (NP) formulation (particle diameter ~25 nm) with superior siRNA delivery efficiency was developed and reported previously. Here, we describe the successful formulation of 111In into LCP for SPECT/CT imaging. Imaging and biodistribution studies showed that, polyethylene glycol grafted 111In-LCP preferentially accumulated in the lymph nodes at ~70% ID/g in both C57BL/6 and nude mice when the improved surface coating method was used. Both the liver and spleen accumulated only ~25% ID/g. Larger LCP (diameter ~67 nm) was less lymphotropic. These results indicate that 25 nm LCP was able to penetrate into tissues, enter the lymphatic system, and accumulate in the lymph nodes via lymphatic drainage due to 1) small size, 2) a well-PEGylated lipid surface, and 3) a slightly negative surface charge. The capability of intravenously injected 111In-LCP to visualize an enlarged, tumor-loaded sentinel lymph node was demonstrated using a 4T1 breast cancer lymph node metastasis model. Systemic gene delivery to the lymph nodes after IV injection was demonstrated by the expression of red fluorescent protein cDNA. The potential of using LCP for lymphatic drug delivery is discussed. PMID:24613050

  11. Node Survival in Networks under Correlated Attacks.

    PubMed

    Hao, Yan; Armbruster, Dieter; Hütt, Marc-Thorsten

    2015-01-01

    We study the interplay between correlations, dynamics, and networks for repeated attacks on a socio-economic network. As a model system we consider an insurance scheme against disasters that randomly hit nodes, where a node in need receives support from its network neighbors. The model is motivated by gift giving among the Maasai called Osotua. Survival of nodes under different disaster scenarios (uncorrelated, spatially, temporally and spatio-temporally correlated) and for different network architectures are studied with agent-based numerical simulations. We find that the survival rate of a node depends dramatically on the type of correlation of the disasters: Spatially and spatio-temporally correlated disasters increase the survival rate; purely temporally correlated disasters decrease it. The type of correlation also leads to strong inequality among the surviving nodes. We introduce the concept of disaster masking to explain some of the results of our simulations. We also analyze the subsets of the networks that were activated to provide support after fifty years of random disasters. They show qualitative differences for the different disaster scenarios measured by path length, degree, clustering coefficient, and number of cycles.

  12. Node Survival in Networks under Correlated Attacks

    PubMed Central

    Hao, Yan; Armbruster, Dieter; Hütt, Marc-Thorsten

    2015-01-01

    We study the interplay between correlations, dynamics, and networks for repeated attacks on a socio-economic network. As a model system we consider an insurance scheme against disasters that randomly hit nodes, where a node in need receives support from its network neighbors. The model is motivated by gift giving among the Maasai called Osotua. Survival of nodes under different disaster scenarios (uncorrelated, spatially, temporally and spatio-temporally correlated) and for different network architectures are studied with agent-based numerical simulations. We find that the survival rate of a node depends dramatically on the type of correlation of the disasters: Spatially and spatio-temporally correlated disasters increase the survival rate; purely temporally correlated disasters decrease it. The type of correlation also leads to strong inequality among the surviving nodes. We introduce the concept of disaster masking to explain some of the results of our simulations. We also analyze the subsets of the networks that were activated to provide support after fifty years of random disasters. They show qualitative differences for the different disaster scenarios measured by path length, degree, clustering coefficient, and number of cycles. PMID:25932635

  13. Sentinel lymph node biopsy in breast cancer

    PubMed Central

    Alsaif, Abdulaziz A.

    2015-01-01

    Objectives: To report our experience in sentinel lymph node biopsy (SLNB) in early breast cancer. Methods: This is a retrospective study conducted at King Khalid University Hospital, Riyadh, Kingdom of Saudi Arabia between January 2005 and December 2014. There were 120 patients who underwent SLNB with frozen section examination. Data collected included the characteristics of patients, index tumor, and sentinel node (SN), SLNB results, axillary recurrence rate and SLNB morbidity. Results: There were 120 patients who had 123 cancers. Sentinel node was identified in 117 patients having 120 tumors (97.6% success rate). No SN was found intraoperatively in 3 patients. Frozen section results showed that 95 patients were SN negative, those patients had no immediate axillary lymph node dissection (ALND), whereas 25 patients were SN positive and subsequently had immediate ALND. Upon further examination of the 95 negative SN’s by hematoxylin & eosin (H&E) and immunohistochemical staining for doubtful H&E cases, 10 turned out to have micrometastases (6 had delayed ALND and 4 had no further axillary surgery). Median follow up of patients was 35.5 months and the mean was 38.8 months. There was one axillary recurrence observed in the SN negative group. The morbidity of SLNB was minimal. Conclusion: The obtainable results from our local experience in SLNB in breast cancer, concur with that seen in published similar literature in particular the axillary failure rate. Sentinel lymph node biopsy resulted in minimal morbidity. PMID:26318461

  14. Design technology co-optimization for 14/10nm metal1 double patterning layer

    NASA Astrophysics Data System (ADS)

    Duan, Yingli; Su, Xiaojing; Chen, Ying; Su, Yajuan; Shao, Feng; Zhang, Recco; Lei, Junjiang; Wei, Yayi

    2016-03-01

    Design and technology co-optimization (DTCO) can satisfy the needs of the design, generate robust design rule, and avoid unfriendly patterns at the early stage of design to ensure a high level of manufacturability of the product by the technical capability of the present process. The DTCO methodology in this paper includes design rule translation, layout analysis, model validation, hotspots classification and design rule optimization mainly. The correlation of the DTCO and double patterning (DPT) can optimize the related design rule and generate friendlier layout which meets the requirement of the 14/10nm technology node. The experiment demonstrates the methodology of DPT-compliant DTCO which is applied to a metal1 layer from the 14/10nm node. The DTCO workflow proposed in our job is an efficient solution for optimizing the design rules for 14/10 nm tech node Metal1 layer. And the paper also discussed and did the verification about how to tune the design rule of the U-shape and L-shape structures in a DPT-aware metal layer.

  15. Ultra-broadband Nonlinear Saturable Absorption for Two-dimensional Bi2TexSe3-x Nanosheets.

    PubMed

    Wang, Yingwei; Liu, Sheng; Yuan, Jian; Wang, Peng; Chen, Jiazhang; Li, Jianbo; Xiao, Si; Bao, Qiaoliang; Gao, Yongli; He, Jun

    2016-01-01

    We report the ultra-broadband nonlinear optical (NLO) response of Bi2TexSe3-x nanosheets produced by a facile solvothermal method. Our result show that the extracted basic optical nonlinearity parameters of Bi2TexSe3-x nanosheets, αNL, Imχ((3)), and FOM reach ~10(4) cm/GW, ~10(-8) esu and ~10(-13) esu cm, respectively, which are several orders of magnitude larger than those of bulk dielectrics. We further observed the excitation intensity dependence of the NLO absorption coefficient and the NLO response sensitivity. The mechanisms of those phenomena were proposed based on physical model. The wavelength dependence of the NLO response of Bi2TexSe3-x nanosheets was investigated, and we determined that the Bi2TexSe3-x nanosheets possess an ultra-broadband nonlinear saturable absorption property covering a range from the visible to the near-infrared band, with the NLO absorption insensitive to the excitation wavelength. This work provide fundamental and systematic insight into the NLO response of Bi2TexSe3-x nanosheets and support their application in photonic devices in the future. PMID:27609149

  16. Comparison of ActiGraph GT3X+ and StepWatch Step Count Accuracy in Geriatric Rehabilitation Patients.

    PubMed

    Webber, Sandra C; St John, Philip D

    2016-07-01

    Activity monitors may not accurately detect steps in hospitalized older adults who walk slowly. We compared ActiGraph GT3X+ step counts (hip and ankle locations, default and low frequency extension [LFE] analyses) to the StepWatch monitor (ankle) during a hallway walk in 38 geriatric rehabilitation patients (83.2 ± 7.1 years of age, 0.4 ± 0.2 m/s gait speed). Absolute percent error values were low (<3%) and did not differ for the StepWatch and the GT3X+ (ankle, LFE); however, error values were high (19-97%) when the GT3X+ was worn at the hip and/ or analyzed with the default filter. Although these finding suggest the GT3X+ (ankle, LFE) functions as well as the StepWatch in detecting steps during walking in older adults with slow gait speeds, further research is needed to determine whether the GT3X+ is also able to disregard other body movements (e.g., fidgeting) that occur when full day monitoring is utilized. PMID:26751505

  17. Cancer-associated mutants of RNA helicase DDX3X are defective in RNA-stimulated ATP hydrolysis

    PubMed Central

    Partridge, Janet F.; Enemark, Eric J.

    2015-01-01

    The DEAD-box RNA helicase DDX3X is frequently mutated in pediatric medulloblastoma. We dissect how these mutants affect DDX3X function with structural, biochemical, and genetic experiments. We identify an N-terminal extension (“ATP-binding loop”, ABL) that is critical for the stimulation of ATP hydrolysis by RNA. We present crystal structures that suggest the ABL interacts dynamically with ATP and confirm the interaction occurs in solution by NMR chemical shift perturbation (CSP) and isothermal calorimetry (ITC). DEAD-box helicases require interaction between two conserved RecA-like helicase domains, D1 and D2 for function. We use NMR CSP to show that DDX3X interacts specifically with double-stranded RNA (dsRNA) through its D1 domain, with contact mediated by residues G302 and G325. Mutants of these residues, G302V and G325E, are associated with pediatric medulloblastoma. These mutants are defective in RNA-stimulated ATP hydrolysis. We show that DDX3X complements the growth defect in a ded1 temperature-sensitive strain of S. pombe, but the cancer-associated mutants G302V and G325E do not complement and exhibit protein expression defects. Taken together, our results suggest that impaired translation of important mRNA targets by mutant DDX3X represents a key step in the development of medulloblastoma. PMID:25724843

  18. Early detection of cognitive deficits in the 3xTg-AD mouse model of Alzheimer's disease.

    PubMed

    Stover, Kurt R; Campbell, Mackenzie A; Van Winssen, Christine M; Brown, Richard E

    2015-08-01

    Which behavioral test is the most sensitive for detecting cognitive deficits in the 3xTg-AD at 6.5 months of age? The 3xTg-AD mouse model of Alzheimer's disease (AD) has three transgenes (APPswe, PS1M146V, and Tau P301L) which cause the development of amyloid beta plaques, neurofibrillary tangles, and cognitive deficits with age. In order to determine which task is the most sensitive in the early detection of cognitive deficits, we compared male and female 3xTg-AD and B6129SF2 wildtype mice at 6.5 months of age on a test battery including spontaneous alternation in the Y-Maze, novel object recognition, spatial memory in the Barnes maze, and cued and contextual fear conditioning. The 3xTg-AD mice had impaired learning and memory in the Barnes maze but performed better than B6129SF2 wildtype mice in the Y-Maze and in contextual fear conditioning. Neither genotype demonstrated a preference in the novel object recognition task nor was there a genotype difference in cued fear conditioning but females performed better than males. From our results we conclude that the 3xTg-AD mice have mild cognitive deficits in spatial learning and memory and that the Barnes maze was the most sensitive test for detecting these cognitive deficits in 6.5-month-old mice.

  19. Superconductivity and Charge Density Wave in ZrTe3-xSex.

    PubMed

    Zhu, Xiangde; Ning, Wei; Li, Lijun; Ling, Langsheng; Zhang, Ranran; Zhang, Jinglei; Wang, Kefeng; Liu, Yu; Pi, Li; Ma, Yongchang; Du, Haifeng; Tian, Minglian; Sun, Yuping; Petrovic, Cedomir; Zhang, Yuheng

    2016-01-01

    Charge density wave (CDW), the periodic modulation of the electronic charge density, will open a gap on the Fermi surface that commonly leads to decreased or vanishing conductivity. On the other hand superconductivity, a commonly believed competing order, features a Fermi surface gap that results in infinite conductivity. Here we report that superconductivity emerges upon Se doping in CDW conductor ZrTe3 when the long range CDW order is gradually suppressed. Superconducting critical temperature Tc(x) in ZrTe3-xSex (0 ≤ x ≤ 0.1) increases up to 4 K plateau for 0.04 ≤ x ≤ 0.07. Further increase in Se content results in diminishing Tc and filametary superconductivity. The CDW modes from Raman spectra are observed in x = 0.04 and 0.1 crystals, where signature of ZrTe3 CDW order in resistivity vanishes. The electronic-scattering for high Tc crystals is dominated by local CDW fluctuations at high temperatures, the resistivity is linear up to highest measured T = 300 K and contributes to substantial in-plane anisotropy. PMID:27253150

  20. Superconductivity and Charge Density Wave in ZrTe3-xSex.

    PubMed

    Zhu, Xiangde; Ning, Wei; Li, Lijun; Ling, Langsheng; Zhang, Ranran; Zhang, Jinglei; Wang, Kefeng; Liu, Yu; Pi, Li; Ma, Yongchang; Du, Haifeng; Tian, Minglian; Sun, Yuping; Petrovic, Cedomir; Zhang, Yuheng

    2016-06-02

    Charge density wave (CDW), the periodic modulation of the electronic charge density, will open a gap on the Fermi surface that commonly leads to decreased or vanishing conductivity. On the other hand superconductivity, a commonly believed competing order, features a Fermi surface gap that results in infinite conductivity. Here we report that superconductivity emerges upon Se doping in CDW conductor ZrTe3 when the long range CDW order is gradually suppressed. Superconducting critical temperature Tc(x) in ZrTe3-xSex (0 ≤ x ≤ 0.1) increases up to 4 K plateau for 0.04 ≤ x ≤ 0.07. Further increase in Se content results in diminishing Tc and filametary superconductivity. The CDW modes from Raman spectra are observed in x = 0.04 and 0.1 crystals, where signature of ZrTe3 CDW order in resistivity vanishes. The electronic-scattering for high Tc crystals is dominated by local CDW fluctuations at high temperatures, the resistivity is linear up to highest measured T = 300 K and contributes to substantial in-plane anisotropy.

  1. Nanostructure investigation of the layered ternary compound Ni3-x Sn1-y Te2

    NASA Astrophysics Data System (ADS)

    Dankwort, T.; Duppel, V.; Deiseroth, H.-J.; Reiner, C.; Schlosser, M.; Kienle, L.

    2016-09-01

    The structure of Ni3-x Sn1-y Te2 is characterized by layered structural motifs related to an average NiAs/Ni2In-type. Order/disorder phenomena were analyzed via a detailed nanostructure investigation including electron diffraction and high resolution transmission electron microscopy (HRTEM) in conjunction with image simulation. Dependent on the stoichiometry, commensurate and incommensurate satellite reflections with respect to the parent NiAs structure were observed in Fourier transform and electron diffraction pattern as a result of occupational modulation of Te and Sn atoms. For the commensurate case a triplication of the c-lattice parameter is evident as a result of Sn-Te-Te stacking. Further, HRTEM micrographs indicate additional ordering phenomena along the c* direction depending on Ni/vacancy ordering which was rationalized by an alternating filling of van der Waals gaps with Ni. Also morphological defects in bright field images were observed. HRTEM investigations prove that these morphological defects are of structural nature, i.e. they are based on domains shifted relative to each other (antiphase boundaries).

  2. Coherent energy scale revealed by ultrafast dynamics of UX3 (X = Al, Sn, Ga) single crystals

    NASA Astrophysics Data System (ADS)

    Nair, Saritha K.; Zhu, J.-X.; Sarrao, J. L.; Taylor, A. J.; Chia, Elbert E. M.

    2012-09-01

    The temperature dependence of relaxation dynamics of UX3 (X = Al, Ga, Sn) compounds is studied using the time-resolved pump-probe technique in reflectance geometry. For UGa3, our data are consistent with the formation of a spin density wave gap as evidenced from the quasidivergence of the relaxation time τ near the Néel temperature TN. For UAl3 and USn3, the relaxation dynamics shows a change from single-exponential to two-exponential behavior below a particular temperature, suggestive of coherence formation of the 5f electrons with the conduction band electrons. This particular temperature can be attributed to the spin fluctuation temperature Tsf, a measure of the strength of Kondo coherence. Our Tsf is consistent with other data such as resistivity and susceptibility measurements. The temperature dependence of the relaxation amplitude and time of UAl3 and USn3 were also fitted by the Rothwarf-Taylor model. Our results show that ultrafast optical spectroscopy is sensitive to c-f Kondo hybridization in the f-electron systems.

  3. Electronic structures and geometries of the XF3 (X = Cl, Br, I, At) fluorides

    NASA Astrophysics Data System (ADS)

    Sergentu, Dumitru-Claudiu; Amaouch, Mohamed; Pilmé, Julien; Galland, Nicolas; Maurice, Rémi

    2015-09-01

    The potential energy surfaces of the group 17 XF3 (X = Cl, Br, I, At) fluorides have been investigated for the first time with multiconfigurational wave function theory approaches. In agreement with experiment, bent T-shaped C2v structures are computed for ClF3, BrF3, and IF3, while we predict that an average D3h structure would be experimentally observed for AtF3. Electron correlation and scalar relativistic effects strongly reduce the energy difference between the D3h geometry and the C2v one, along the XF3 series, and in the X = At case, spin-orbit coupling also slightly reduces this energy difference. AtF3 is a borderline system where the D3h structure becomes a minimum, i.e., the pseudo-Jahn-Teller effect is inhibited since electron correlation and scalar-relativistic effects create small energy barriers leading to the global C2v minima, although both types of effects interfere.

  4. Electronic structures and geometries of the XF{sub 3} (X = Cl, Br, I, At) fluorides

    SciTech Connect

    Sergentu, Dumitru-Claudiu; Amaouch, Mohamed; Pilmé, Julien; Galland, Nicolas; Maurice, Rémi

    2015-09-21

    The potential energy surfaces of the group 17 XF{sub 3} (X = Cl, Br, I, At) fluorides have been investigated for the first time with multiconfigurational wave function theory approaches. In agreement with experiment, bent T-shaped C{sub 2v} structures are computed for ClF{sub 3}, BrF{sub 3}, and IF{sub 3}, while we predict that an average D{sub 3h} structure would be experimentally observed for AtF{sub 3}. Electron correlation and scalar relativistic effects strongly reduce the energy difference between the D{sub 3h} geometry and the C{sub 2v} one, along the XF{sub 3} series, and in the X = At case, spin-orbit coupling also slightly reduces this energy difference. AtF{sub 3} is a borderline system where the D{sub 3h} structure becomes a minimum, i.e., the pseudo-Jahn-Teller effect is inhibited since electron correlation and scalar-relativistic effects create small energy barriers leading to the global C{sub 2v} minima, although both types of effects interfere.

  5. Physical properties of the van der Waals bonded ferromagnet Fe3-xGeTe2

    NASA Astrophysics Data System (ADS)

    May, Andrew; Calder, Stuart; Cantoni, Claudia; Cao, Huibo; McGuire, Michael

    Fe3GeTe2 is an itinerant ferromagnetic with a layered structure held together by van der Waals bonds. The material has been synthesized using a flux-growth technique that results in large single crystals suitable for neutron scattering, and its magnetic structure and phase diagram have been investigated. The flux-grown crystals possess a Curie temperature TC ~ 150K, which is less than that reported for polycrystalline Fe3GeTe2 with TC ~ 230K. The difference is explained by intrinsic Fe-deficiency in these single crystals. This talk will summarize the physical properties of the flux grown single crystals and a series of polycrystalline samples with varying concentrations of Fe, which reveal how Fe content is correlated to structural parameters and TC. In combination with the magnetic properties, Hall effect and thermoelectric data reveal that Fe3-xGeTe2 compounds are multi-carrier type, itinerant ferromagnets. Research supported by the US DOE, Office of Science, Basic Energy Sciences, Materials Sciences and Engineering Division.

  6. Electronic structures and geometries of the XF3 (X = Cl, Br, I, At) fluorides.

    PubMed

    Sergentu, Dumitru-Claudiu; Amaouch, Mohamed; Pilmé, Julien; Galland, Nicolas; Maurice, Rémi

    2015-09-21

    The potential energy surfaces of the group 17 XF3 (X = Cl, Br, I, At) fluorides have been investigated for the first time with multiconfigurational wave function theory approaches. In agreement with experiment, bent T-shaped C(2v) structures are computed for ClF3, BrF3, and IF3, while we predict that an average D(3h) structure would be experimentally observed for AtF3. Electron correlation and scalar relativistic effects strongly reduce the energy difference between the D(3h) geometry and the C(2v) one, along the XF3 series, and in the X = At case, spin-orbit coupling also slightly reduces this energy difference. AtF3 is a borderline system where the D(3h) structure becomes a minimum, i.e., the pseudo-Jahn-Teller effect is inhibited since electron correlation and scalar-relativistic effects create small energy barriers leading to the global C(2v) minima, although both types of effects interfere.

  7. Zn-Site Determination in Protein Encapsulated ZnxFe3-xO4 Nanoparticles

    SciTech Connect

    Pool, V. L.; Klem, M. T.; Holroyd, J.; Harris, T.; Arenholz, E.; Young, M.; Douglas, T.; Idzerda, Y. U.

    2008-10-01

    The X-ray absorption spectra of the Fe and Zn L-edges for 6.7 nm Fe{sub 3}O{sub 4} nanoparticles grown inside 12 nm ferritin protein cages with 10%, 15%, 20% and 33% zinc doping, shows that the Zn is substitutional as Zn{sup 2+} within the iron oxide host structure. A Neel-Arrhenius plot of the blocking temperature in the frequency dependent ac-susceptibility measurements show that the particles are non-interacting and that the anisotropy energy barrier is reduced with Zn loading. X-ray magnetic circular dichroism (XMCD) of the Fe displays a linear decrease with Zn-doping in sharp contrast to the initial increase present in the bulk system. The most plausible explanation for the moment decrease is that Zn substitutes preferentially into the tetrahedral A-site as a Zn{sup 2+} cation, generating a mixed spinel.

  8. Magnetic and thermoelectric properties of Fe3-xCoxO4 thin films and CoFe2O4/Fe3O4 superlattices

    NASA Astrophysics Data System (ADS)

    Nguyen van, Quang; Christian, Meny; Duong, Anh Tuan; Shin, Yooleemi; S. H, Rhim; Nguyen Thi, Minh Hai; Cho, Sunglae

    2015-03-01

    Microcrystalline ferrites are used as a medium for the magnetic recording and storage of information. Magnetite, Fe3O4, is a ferrimagnet with a cubic inverse spinel structure and exhibits a metal-insulator, Verwey, transition at about 120 K. It is predicted to possess as half-metallic nature, ~ 100% spin polarization, and high TC (850 K). Cobalt ferrite, Co3O4, is one of the most important members of the ferrite family, which is characterized by its high HC, moderate magnetization and very high magnetocrystalline anisotropy. Here we report on the magnetic and thermoelectric properties of Fe3-xCoxO4 (x = 0 to 1) thin films and CoFe2O4/Fe3O4 superlattices grown on MgO (100) by MBE. XRD and RHEED patterns confirmed the inverse spinel structure of the Fe3O4 films. Magnetic properties of the Fe3-xCoxO4 films are markedly sensitive to the Co content. The Verwey transition was disappeared in Co-doped films. A negative MR curve with butterfly shape was observed with low Co content but disappeared for the samples with x = 0.8 and 1. Seebeck coefficients increased with Co concentration; -70 μV/K for x =0 and -220 μV/K for x =1. We will also discuss on the relationship between magnetic and thermoelectric characteristics in CoFe2O4/Fe3O4 superlattices with the modulations of 5, 10, and 20 nm.

  9. Communication: Fixed-node errors in quantum Monte Carlo: Interplay of electron density and node nonlinearities

    SciTech Connect

    Rasch, Kevin M.; Hu, Shuming; Mitas, Lubos

    2014-01-28

    We elucidate the origin of large differences (two-fold or more) in the fixed-node errors between the first- vs second-row systems for single-configuration trial wave functions in quantum Monte Carlo calculations. This significant difference in the valence fixed-node biases is studied across a set of atoms, molecules, and also Si, C solid crystals. We show that the key features which affect the fixed-node errors are the differences in electron density and the degree of node nonlinearity. The findings reveal how the accuracy of the quantum Monte Carlo varies across a variety of systems, provide new perspectives on the origins of the fixed-node biases in calculations of molecular and condensed systems, and carry implications for pseudopotential constructions for heavy elements.

  10. Clock Agreement Among Parallel Supercomputer Nodes

    DOE Data Explorer

    Jones, Terry R.; Koenig, Gregory A.

    2014-04-30

    This dataset presents measurements that quantify the clock synchronization time-agreement characteristics among several high performance computers including the current world's most powerful machine for open science, the U.S. Department of Energy's Titan machine sited at Oak Ridge National Laboratory. These ultra-fast machines derive much of their computational capability from extreme node counts (over 18000 nodes in the case of the Titan machine). Time-agreement is commonly utilized by parallel programming applications and tools, distributed programming application and tools, and system software. Our time-agreement measurements detail the degree of time variance between nodes and how that variance changes over time. The dataset includes empirical measurements and the accompanying spreadsheets.

  11. Space Station resource node flow field analysis

    NASA Technical Reports Server (NTRS)

    Kania, Lee; Kumar, Ganesh; Mcconnaughey, Paul

    1991-01-01

    An analysis of the flow field within the Space Station Freedom resource node with operational intermodule ventilation and temperature/humidity control ventilation systems has been conducted. The INS3D code, an incompressible, steady-state Navier-Stokes solver has been used to assess the design of the ventilation system via quantification of the level of fluid mixing and identification of 'dead air' regions and short-circuit ventilation. Numerical results indicate significant short-circuit ventilation in the forward and midsections of the node and insufficient fluid mixing is found to exist in the aft node section. These results as well as results from a solution grid dependence study are presented.

  12. Vital nodes identification in complex networks

    NASA Astrophysics Data System (ADS)

    Lü, Linyuan; Chen, Duanbing; Ren, Xiao-Long; Zhang, Qian-Ming; Zhang, Yi-Cheng; Zhou, Tao

    2016-09-01

    Real networks exhibit heterogeneous nature with nodes playing far different roles in structure and function. To identify vital nodes is thus very significant, allowing us to control the outbreak of epidemics, to conduct advertisements for e-commercial products, to predict popular scientific publications, and so on. The vital nodes identification attracts increasing attentions from both computer science and physical societies, with algorithms ranging from simply counting the immediate neighbors to complicated machine learning and message passing approaches. In this review, we clarify the concepts and metrics, classify the problems and methods, as well as review the important progresses and describe the state of the art. Furthermore, we provide extensive empirical analyses to compare well-known methods on disparate real networks, and highlight the future directions. In spite of the emphasis on physics-rooted approaches, the unification of the language and comparison with cross-domain methods would trigger interdisciplinary solutions in the near future.

  13. Energy Options for Wireless Sensor Nodes

    PubMed Central

    Knight, Chris; Davidson, Joshua; Behrens, Sam

    2008-01-01

    Reduction in size and power consumption of consumer electronics has opened up many opportunities for low power wireless sensor networks. One of the major challenges is in supporting battery operated devices as the number of nodes in a network grows. The two main alternatives are to utilize higher energy density sources of stored energy, or to generate power at the node from local forms of energy. This paper reviews the state-of-the art technology in the field of both energy storage and energy harvesting for sensor nodes. The options discussed for energy storage include batteries, capacitors, fuel cells, heat engines and betavoltaic systems. The field of energy harvesting is discussed with reference to photovoltaics, temperature gradients, fluid flow, pressure variations and vibration harvesting.

  14. SpicyNodes Radial Map Engine

    NASA Astrophysics Data System (ADS)

    Douma, M.; Ligierko, G.; Angelov, I.

    2008-10-01

    The need for information has increased exponentially over the past decades. The current systems for constructing, exploring, classifying, organizing, and searching information face the growing challenge of enabling their users to operate efficiently and intuitively in knowledge-heavy environments. This paper presents SpicyNodes, an advanced user interface for difficult interaction contexts. It is based on an underlying structure known as a radial map, which allows users to manipulate and interact in a natural manner with entities called nodes. This technology overcomes certain limitations of existing solutions and solves the problem of browsing complex sets of linked information. SpicyNodes is also an organic system that projects users into a living space, stimulating exploratory behavior and fostering creative thought. Our interactive radial layout is used for educational purposes and has the potential for numerous other applications.

  15. Saddle-node bifurcation of viscous profiles

    NASA Astrophysics Data System (ADS)

    Achleitner, Franz; Szmolyan, Peter

    2012-10-01

    Traveling wave solutions of viscous conservation laws, that are associated to Lax shocks of the inviscid equation, have generically a transversal viscous profile. In the case of a non-transversal viscous profile we show by using Melnikov theory that a parametrized perturbation of the profile equation leads generically to a saddle-node bifurcation of these solutions. An example of this bifurcation in the context of magnetohydrodynamics is given. The spectral stability of the traveling waves generated in the saddle-node bifurcation is studied via an Evans function approach. It is shown that generically one real eigenvalue of the linearization of the viscous conservation law around the parametrized family of traveling waves changes its sign at the bifurcation point. Hence this bifurcation describes the basic mechanism of a stable traveling wave which becomes unstable in a saddle-node bifurcation.

  16. Diagnosis of pelvic lymph node metastasis in prostate cancer using single optical fiber probe.

    PubMed

    Denkçeken, Tuba; Canpolat, Murat; Baykara, Mehmet; Başsorgun, İbrahim; Aktaş-Samur, Anıl

    2016-09-01

    Elastic light single-scattering spectroscopy system (ELSSS) is a biomedical tool which is used for detection of cancerous tissues ex-vivo. ELSSS spectra depend primarily on the size of scatterers in the tissue and are not directly related to changes in the absorption which are caused by variations of the biological macromolecules. In the present study, we aimed to detect metastasis in the pelvic lymph node by using combination of Principal Components Analysis (PCA) and Linear Discriminant Analysis (LDA). Single-scattering spectra in the 450-750nm wavelength regions were obtained from the total of 83 reactive lymph node and 12 metastatic lymph node samples from 10 prostatic cancer patients. The ELSSS spectral data were compared against the "gold standard" histopathology results. Data analyses were done via using PCA, followed by LDA. Receiver Operating Characteristic (ROC) curve analysis was employed for differentiating performance. The classification based on discriminant score provided sensitivity of 100% and specificity of 96.4%, in differentiating non-metastatic (reactive) from metastatic pelvic lymph nodes, with a Positive Predictive Value (PPV) of 0.8, a Negative Predictive Value (NPV) of 0.99 and the area under the ROC curve (AUC) of 0.99, respectively. In this study, it was shown that ELSSS system can accurately distinguish reactive and metastatic pelvic lymph nodes of prostate cancer with high PPV and NPV. It can be concluded that diagnostic accuracy of ELSSS system allows detecting metastatic tissues during operation.

  17. Spatiotemporal modeling of node temperatures in supercomputers

    DOE PAGES

    Storlie, Curtis Byron; Reich, Brian James; Rust, William Newton; Ticknor, Lawrence O.; Bonnie, Amanda Marie; Montoya, Andrew J.; Michalak, Sarah E.

    2016-06-10

    Los Alamos National Laboratory (LANL) is home to many large supercomputing clusters. These clusters require an enormous amount of power (~500-2000 kW each), and most of this energy is converted into heat. Thus, cooling the components of the supercomputer becomes a critical and expensive endeavor. Recently a project was initiated to investigate the effect that changes to the cooling system in a machine room had on three large machines that were housed there. Coupled with this goal was the aim to develop a general good-practice for characterizing the effect of cooling changes and monitoring machine node temperatures in this andmore » other machine rooms. This paper focuses on the statistical approach used to quantify the effect that several cooling changes to the room had on the temperatures of the individual nodes of the computers. The largest cluster in the room has 1,600 nodes that run a variety of jobs during general use. Since extremes temperatures are important, a Normal distribution plus generalized Pareto distribution for the upper tail is used to model the marginal distribution, along with a Gaussian process copula to account for spatio-temporal dependence. A Gaussian Markov random field (GMRF) model is used to model the spatial effects on the node temperatures as the cooling changes take place. This model is then used to assess the condition of the node temperatures after each change to the room. The analysis approach was used to uncover the cause of a problematic episode of overheating nodes on one of the supercomputing clusters. Lastly, this same approach can easily be applied to monitor and investigate cooling systems at other data centers, as well.« less

  18. Incidence of metastasis in circumflex iliac nodes distal to the external iliac nodes in cervical cancer

    PubMed Central

    Okamoto, Kazuhira; Kato, Hidenori

    2016-01-01

    Objective A causal relationship between removal of circumflex iliac nodes distal to the external iliac nodes (CINDEIN) and lower leg edema has been recently suggested. The aim of this study was to elucidate the incidence of CINDEIN metastasis in cervical cancer. Methods A retrospective chart review was carried out for 531 patients with cervical cancer who underwent lymph node dissection between 1993 and 2014. CINDEIN metastasis was pathologically identified by microscopic investigation. After 2007, sentinel lymph node biopsy was performed selectively in patients with non-bulky cervical cancer. The sentinel node was identified using 99mTc-phytate and by scanning the pelvic cavity with a γ probe. Results Two hundred and ninety-seven patients (55.9%) underwent CINDEIN dissection and 234 (44.1%) did not. The percentage of International Federation of Gynecology and Obstetrics stage IIb to IV (42.4% vs. 23.5%, p<0.001) was significantly higher in patients who underwent CINDEIN dissection than those who did not. CINDEIN metastasis was identified in 1.9% overall and in 3.4% of patients who underwent CINDEIN dissection. For patients with stage Ia to IIa disease, CINDEIN metastasis was identified in 0.6% overall and in 1.2% of patients who underwent CINDEIN dissection. Of 115 patients with sentinel node mapping, only one (0.9%) had CINDEIN detected as a sentinel node. In this case, the other three lymph nodes were concurrently detected as sentinel lymph nodes. Conclusion CINDEIN dissection can be eliminated in patients with stage Ia to IIa disease. CINDEIN might not be regional lymph nodes in cervical cancer. PMID:27102250

  19. A sequence of transformations related to the formation of M{sub 3}X{sub 2}-type superstructures

    SciTech Connect

    Gusev, A. I.

    2015-01-15

    A symmetry analysis of monoclinic, orthorhombic, and trigonal M{sub 3}X{sub 2}-type superstructures that can be formed in strongly stoichiometric MX{sub y} compounds with B1 structure is carried out. Channels of order-disorder transitions MX{sub y} → M{sub 3}X{sub 2} are determined. It is shown that, as temperature decreases, two physically admissible sequences of transformations associated with the formation of M{sub 3}X{sub 2} superstructures are possible in nonstoichiometric MX{sub y} compounds of group IV transition metals. By an example of vanadium carbide VC{sub y}, it is demonstrated that orthorhombic or monoclinic V{sub 3}C{sub 2} superstructures can be obtained with the formation of a nanostructure.

  20. The Effects of Thermal and Polarization Fluctuations on a Phase Sensitive Strain Monitoring System Utilizing a 3x3 Coupler

    NASA Astrophysics Data System (ADS)

    Wiener, Timothy; Seaver, Mark; Todd, Michael

    2002-03-01

    Recently, Todd et al. introduced a novel fiber Bragg grating (FBG) interrogation system based on a scanning fiber Fabry-Perot (FFP) filter, a Mach-Zehnder interferometer, and a 3x3 coupler for passive demodulation using an intensity-fluctuation independent algorithm [1]. The phase resolution and accuracy of the system is heavily dependent upon a variety of both optical and electronic factors. This paper presents an experimental investigation of variations in the scattering matrix of a 3x3 coupler resulting from variations in temperature and input state-of-polarization (SOP). Results are described in terms of sensitivities of the coupler complex matrix elements to each of the effects, and conclusions regarding sensor system performance are drawn. [1] M. D. Todd et al, "A Novel Bragg Grating Sensor Interrogation System Utilizing a Scanning Filter, a Mach-Zehnder Inteferometer, and a 3x3 Coupler," Meas. Sci. and Technol., Vol. 12, 771-777, 2001.

  1. In-situ observation of self-regulated switching behavior in WO{sub 3-x} based resistive switching devices

    SciTech Connect

    Hong, D. S.; Wang, W. X.; Chen, Y. S. Sun, J. R.; Shen, B. G.

    2014-09-15

    The transmittance of tungsten oxides can be adjusted by oxygen vacancy (V{sub o}) concentration due to its electrochromic property. Here, we report an in-situ observation of resistive switching phenomenon in the oxygen-deficient WO{sub 3-x} planar devices. Besides directly identifying the formation/rupture of dark-colored conductive filaments in oxide layer, the stripe-like WO{sub 3-x} device demonstrated self-regulated switching behavior during the endurance testing, resulting in highly consistent switching parameters after a stabilizing process. For very high V{sub o}s mobility was demonstrated in the WO{sub 3-x} film by the pulse experiment, we suggested that the electric-field-induced homogeneous migration of V{sub o}s was the physical origin for such unique switching characteristics.

  2. Intravertebral disk herniations: cartilaginous (Schmorl's) nodes.

    PubMed

    Resnick, D; Niwayama, G

    1978-01-01

    Cartilaginous (Schmorl's) nodes are related to prolapses of intervertebral disk material into the vertebral body. These nodes can be produced by any process which weakens either the cartilaginous plate covering the superior and inferior surfaces of the vertebral body or the subchondral trabeculae of the vertebra. Such processes include juvenile kyphosis, trauma, metabolic and neoplastic disorders, and degenerative disk disease. Radiographic abnormalities include indentations of vertebral outline and radiolucencies within the vertebral body with varying degrees of sclerosis. These can be readily differentiated from other vertebral alterations such as "butterfly", "fish", and "H" vertebrae.

  3. Transbronchial aspiration of subcarinal lymph nodes.

    PubMed

    Blainey, A D; Curling, M; Green, M

    1988-04-01

    Transbronchial needle aspiration of subcarinal lymph nodes has been undertaken in 60 consecutive patients with pulmonary malignancies undergoing routine fibreoptic bronchoscopy. Four aspirates from the subcarinal nodes contained malignant cells; three squamous cell carcinoma and one adenocarcinoma. Four of 40 (10%) of patients with non-small-cell carcinoma of the lung had a positive aspirate. We have not confirmed the high positive rate previously reported, but nevertheless transbronchial needle aspiration provided useful staging information in some patients. The technique is rapid, safe and simple, and can easily be applied in a routine bronchoscopy service for all patients with suspected cancer, or selected patients under active consideration for surgery. PMID:3166928

  4. Functional morphology of the pig sinoatrial node.

    PubMed

    Opthof, T; de Jonge, B; Jongsma, H J; Bouman, L N

    1987-12-01

    The porcine sinoatrial node in an isolated right atrium preparation is characterized by unifocal impulse generation. It has a rather elongated shape and the larger part of its volume is taken up by collagen and fibroblasts. The impulse appears to emerge from a site where the percentage of myofilaments is relatively low. The impulse is propagated faster towards the crista terminalis than to the interatrial septum with preference for the oblique-upward direction. A very large zone of cells with low excitability is located at the interatrial septal side of the node.

  5. Searching for nodes in random graphs.

    PubMed

    Lancaster, David

    2011-11-01

    We consider the problem of searching for a node on a labeled random graph according to a greedy algorithm that selects a route to the desired node using metric information on the graph. Motivated by peer-to-peer networks two types of random graph are proposed with properties particularly amenable to this kind of algorithm. We derive equations for the probability that the search is successful and also study the number of hops required, finding both numerical and analytic evidence of a transition as the number of links is varied.

  6. Fe3-xTixO4 Nanoparticles as Tunable Probes of Microbial Metal Oxidation

    SciTech Connect

    Liu, Juan; Pearce, Carolyn I.; Liu, Chongxuan; Wang, Zheming; Shi, Liang; Arenholz, Elke; Rosso, Kevin M.

    2013-05-14

    Present and emerging biotechnological applications for iron (oxyhydr)oxide nanomaterials depend on their interaction with microorganisms, as do their toxicity, transport, and fate in biological and environmental systems. However, mass or electron transfer along key molecular pathways at microbe-nanomaterial interfaces is extremely difficult to quantify because of system complexity. Inspired by Fe(II)-oxidizing microbes widespread in nature, we isolate and characterize one such pathway by examining the oxidation of Fe3-xTixO4 (magnetite-titanomagnetite) nanoparticles by the bacterial electron transfer enzyme MtoA, a decaheme c-type cytochrome. Oxidation by MtoA was studied as a function of the thermodynamic driving force for electron transfer by controlling the Ti(IV) doping content (x), which tunes the solid-state Fe(II)/Fe(III) ratio built into the nanoparticles. A higher Fe(II)/Fe(III) ratio appears to proportionally increase the electron transfer kinetics to the cytochrome. In situ x-ray diffraction indicated that during oxidation the spinel ferrite lattice remains intact while structural Fe(II) is progressively depleted. Surface and atomic site specific Fe L2,3-edge x-ray magnetic circular dichroism indicated that MtoA directly accesses magnetically-ordered B-sublattice Fe(II) at the interface. This study provides first quantitative insights into an isolated molecular pathway for biotransformation of iron (oxyhydr)oxide nanomaterials. And, more generally, it also illustrates new techniques for probing these pathways in detail, featuring use of tailored nanoparticles, purified metalloenzyme, and synchrotron x-ray absorption spectroscopies.

  7. Engineering of Methylation State Specific 3xMBT Domain Using ELISA Screening

    PubMed Central

    Feldman, Michal; Zarivach, Raz; Aharoni, Amir; Levy, Dan

    2016-01-01

    The ε-amino group of lysine residues may be mono-, di- or tri-methylated by protein lysine methyltransferases. In the past few years it has been highly considered that methylation of both histone and non-histone proteins has fundamental role in development and progression of various human diseases. Thus, the establishment of tools to study lysine methylation that will distinguish between the different states of methylation is required to elucidate their cellular functions. The 3X malignant brain tumor domain (3XMBT) repeats of the Lethal(3)malignant brain tumor-like protein 1 (L3MBTL1) have been utilized in the past as an affinity reagent for the identification of mono- and di-methylated lysine residues on individual proteins and on a proteomic scale. Here, we have utilized the 3XMBT domain to develop an enzyme-linked immunosorbent assay (ELISA) that allows the high-throughput detection of 3XMBT binding to methylated lysines. We demonstrated that this system allows the detection of methylated peptides, methylated proteins and PKMT activity on both peptides and proteins. We also optimized the assay to detect 3XMBT binding in crude E. coli lysates which facilitated the high throughput screening of 3XMBT mutant libraries. We have utilized protein engineering tools and generated a double site saturation 3XMBT library of residues 361 and 411 that were shown before to be important for binding mono and di-methylated substrates and identified variants that can exclusively recognize only di-methylated peptides. Together, our results demonstrate a powerful new approach that will contribute to deeper understanding of lysine methylation biology and that can be utilized for the engineering of domains for specific binders of other post-translational modifications. PMID:27111853

  8. Coupling with a narrow-band-gap semiconductor for the enhancement of visible-light photocatalytic activity: preparation of Bi2OxS3-x/Nb6O17 and application to the degradation of methyl orange.

    PubMed

    Yan, Gang; Shi, Hongfei; Tan, Huaqiao; Zhu, Wanbin; Wang, Yonghui; Zang, Hongying; Li, Yangguang

    2016-09-21

    A series of 2D sheet Bi2OxS3-x/Nb6O17 (Bi/Nb) heterostructure photocatalysts were synthesized through a facile hydrothermal vulcanization method between Bi(3+) exchanged K4Nb6O17 and thiourea (NH2CSNH2). XRD results confirm that the heterostructures were composed of Bi2OxS3-x and Nb6O17. HRTEM indicates that Bi2OxS3-x was successfully intercalated into layers of K4Nb6O17. Such large interfacial contacts can be beneficial to the transfer and separation of photogenerated charge carriers. Thus the composites exhibit good photocatalytic performance for the degradation of methyl orange (MO) under visible light irradiation (λ > 400 nm), which is superior to that of both precursors, pure Bi2S3 and K4Nb6O17. Radical capture tests reveal that photogenerated holes h(+) and ˙O2(-) play important roles in the photodegradation of MO. And based on the UV-visible diffuse reflectance spectra (DRS) and the band gap of the semiconductors, the mechanism of the enhanced visible light photocatalytic activity of these composites has been proposed. PMID:27526958

  9. Coupling with a narrow-band-gap semiconductor for the enhancement of visible-light photocatalytic activity: preparation of Bi2OxS3-x/Nb6O17 and application to the degradation of methyl orange.

    PubMed

    Yan, Gang; Shi, Hongfei; Tan, Huaqiao; Zhu, Wanbin; Wang, Yonghui; Zang, Hongying; Li, Yangguang

    2016-09-21

    A series of 2D sheet Bi2OxS3-x/Nb6O17 (Bi/Nb) heterostructure photocatalysts were synthesized through a facile hydrothermal vulcanization method between Bi(3+) exchanged K4Nb6O17 and thiourea (NH2CSNH2). XRD results confirm that the heterostructures were composed of Bi2OxS3-x and Nb6O17. HRTEM indicates that Bi2OxS3-x was successfully intercalated into layers of K4Nb6O17. Such large interfacial contacts can be beneficial to the transfer and separation of photogenerated charge carriers. Thus the composites exhibit good photocatalytic performance for the degradation of methyl orange (MO) under visible light irradiation (λ > 400 nm), which is superior to that of both precursors, pure Bi2S3 and K4Nb6O17. Radical capture tests reveal that photogenerated holes h(+) and ˙O2(-) play important roles in the photodegradation of MO. And based on the UV-visible diffuse reflectance spectra (DRS) and the band gap of the semiconductors, the mechanism of the enhanced visible light photocatalytic activity of these composites has been proposed.

  10. Self-Powered, High-Speed and Visible-Near Infrared Response of MoO(3-x)/n-Si Heterojunction Photodetector with Enhanced Performance by Interfacial Engineering.

    PubMed

    Zhao, Chuanxi; Liang, Zhimin; Su, Mingze; Liu, Pengyi; Mai, Wenjie; Xie, Weiguang

    2015-11-25

    Photodetectors with a wide spectrum response are important components for sensing, imaging, and other optoelectronic applications. A molybdenum oxide (MoO(3-x))/Si heterojunction has been applied as solar cells with great success, but its potential in photodetectors has not been explored yet. Herein, a self-powered, high-speed heterojunction photodetector fabricated by coating an n-type Si hierarchical structure with an ultrathin hole-selective layer of molybdenum oxide (MoO(3-x)) is first investigated. Excellent and stable photoresponse performance is obtained by using a methyl group passivated interface. The heterojunction photodetector demonstrated high sensitivity to a wide spectrum from 300 to 1100 nm. The self-powered photodetector shows a high detectivity of (∼6.29 × 10(12) cmHz(1/2) W(-1)) and fast response time (1.0 μs). The excellent photodetecting performance is attributed to the enhanced interfacial barrier height and three-dimensional geometry of Si nanostructures, which is beneficial for efficient photocarrier collection and transportation. Finally, our devices show excellent long-term stability in air for 6 months with negligible performance degradation. The thermal evaporation method for large-scale fabrication of MoO(3-x)/n-Si photodetectors makes it suitable for self-powered, multispectral, and high-speed response photodetecting applications.

  11. Enhancement of node connectivity for mobile ad hoc networks

    NASA Astrophysics Data System (ADS)

    Shi, Xiyu; Li, Fanzhi; Adams, Christopher

    2006-05-01

    For secure mobile wireless networks whose topologies are changed dynamically in insecure environments, mobile users need to keep in contact with each other for the purpose of user authentications. For instance, the network formed by a group of soldiers equipped with wireless devices in a battlefield. Maintaining a high connectivity is crucial in such networks in order to authenticate scattered individuals and to be able to communicate with each other. To establish connections, different mobile ad hoc network routing protocols have been developed. However, much research has shown that these protocols are incapable of maintaining high connectivity when the node density is lower in the network. This paper proposes a mechanism to enhance the node connectivity, which is specifically effective for mobile ad hoc networks with lower node densities. It selects some nodes with larger transmission power as strategic nodes to assist in establishing connections with remote nodes, which are unable to connect with otherwise. The strategic nodes have the ability to connect with each other. Whenever a remote mobile node has a request to connect to another remote mobile node, the strategic nodes function as normal mobile nodes and may forward the connection requests to the desired remote destination node. The mechanism is simulated in different scenarios with various node densities, and the results show that the node connectivity is generally enhanced with the benefit of lower node density network, gaining significant improvement.

  12. Tunable electric properties of half-metallic Zn x Fe3-x O4 and the characteristics of Zn x Fe3-x O4 /n-type Si interfaces

    NASA Astrophysics Data System (ADS)

    He, Jie; Wang, Changhong; Cheng, Yahui; Liu, Mengyin; Wang, Weichao; Wang, Weihua; Lu, Feng; Gao, Kuanghong; Li, Zhiqing; Liu, Hui

    2016-03-01

    The physical properties of Zn-doped Fe3O4 (i.e. Zn x Fe3-x O4 with 0≤slant x≤slant 1 ) synthesised by the sol-gel method have been investigated systematically. X-ray diffraction and x-ray photoelectron spectroscopy (XPS) measurements prove that Zn ions have been doped into the Fe3O4 crystal lattice. The valence band XPS spectra show that the carrier concentration decreases with increasing the Zn content. The electric measurements reveal that the resistivity increases when increasing the Zn concentration. The absolute value of the magnetoresistance of Zn x Fe3-x O4 is above 3.11% at room temperature, indicating that the samples maintain high spin polarisation after Zn2+ doping. The fitting of the current-voltage curves of Zn x Fe3-x O4/n-type Si heterostructures demonstrates that the height of the Schottky barrier reduces continuously from 0.82 eV to 0.76 eV with increasing x. The results may recommend Zn x Fe3-x O4 as a potential material for spintronic applications.

  13. Difference of perceiving object softness during palpation through single-node and multi-node contacts.

    PubMed

    Widmer, Antoine; Hu, Yaoping

    2012-01-01

    Virtual Reality (VR) simulators can offer alternatives for training procedures in the medical field. Most current VR simulators consider single-node contact for interacting with an object to convey displacement and force on a discrete mesh. However, a single-node contact does not closely simulate palpation, which requires a surface made of a multi-node contact to touch a soft object. Thus, we hypothesize that the softness of a deformable object (such as a virtual breast phantom) palpated through a single-node contact would be perceived differently from that of the same phantom palpated through a multi-node contact with various force arrays. We conducted a study to investigate this hypothesis. Using a co-located VR setup that aligns visual and haptic stimuli onto a spatial location, we tested 15 human participants under conditions of both visual and haptic stimuli available and only visual (or haptic) stimulus available. In a trial, each participant palpated and discriminated two virtual breast phantoms of same softness through different contacts with varying force arrays. The results of this study revealed that virtual breast phantoms palpated through a single-node contact were constantly perceived harder than their counterparts palpated through a multi-node contact with varying force arrays, when visual stimuli were available. These results imply a constraint for developing a VR system of training palpation.

  14. Characterization of strain in sub-100 nm silicon transistors by convergent-beam electron diffraction

    NASA Astrophysics Data System (ADS)

    Zhang, Peng

    As silicon devices shrink further beyond the 65 nm technology node, strain is increasingly important for the fabrication and operation of nano-devices. According to the latest International Technology Roadmap for Semiconductors, however, the detection and mapping of strain at the required nanometer spatial resolution has yet to be achieved. The project is to evaluate the convergent-beam electron diffraction (CBED) technique in a transmission electron microscope (TEM) as a nanoscale strain metrology. In this work, by using energy-filtered CBED under scanning TEM (STEM) mode, we have successfully measured strain in two types of sub-100 nm semiconductor structures: 90 nm node and 65 nm node shallow trench isolation (STI) structures, and a 65 nm node locally strained p-type metal-oxide semiconductor field-effect transistor (P-MOSFET, or PMOS) featuring SiGe source and drain (S/D). In the 90 nm STI structures, the strain is generally less than 0.1%. Nevertheless, CBED is sensitive enough to tell the strain difference in two 90 nm STI structures with different oxide trench filling conditions. In the 65 nm STI structure, the strain tensors at different positions around the oxide trench filling are measured. The experimental results are compared with finite element modeling based on isotropic elasticity theory. A large discrepancy is found between experiments and simulation, which suggests that a more sophisticated model is necessary for accurate modeling, and more importantly that CBED strain measurements can be used to check the applicability of models at nanometer scale. In the 65 nm node uniaxially strained PMOS, the lattice parameters of silicon at a distance of 25 nm to 55nm below the gate are measured. It is found that at 25 below the gate, the major stress component, 1.1 GPa, is compressive along the source-drain axis. It is also noticed that in the strained silicon area, all three diagonal components of the strain tensor are compressive. Thus the CBED strain

  15. Measure of Node Similarity in Multilayer Networks

    PubMed Central

    Mollgaard, Anders; Zettler, Ingo; Dammeyer, Jesper; Jensen, Mogens H.; Lehmann, Sune; Mathiesen, Joachim

    2016-01-01

    The weight of links in a network is often related to the similarity of the nodes. Here, we introduce a simple tunable measure for analysing the similarity of nodes across different link weights. In particular, we use the measure to analyze homophily in a group of 659 freshman students at a large university. Our analysis is based on data obtained using smartphones equipped with custom data collection software, complemented by questionnaire-based data. The network of social contacts is represented as a weighted multilayer network constructed from different channels of telecommunication as well as data on face-to-face contacts. We find that even strongly connected individuals are not more similar with respect to basic personality traits than randomly chosen pairs of individuals. In contrast, several socio-demographics variables have a significant degree of similarity. We further observe that similarity might be present in one layer of the multilayer network and simultaneously be absent in the other layers. For a variable such as gender, our measure reveals a transition from similarity between nodes connected with links of relatively low weight to dis-similarity for the nodes connected by the strongest links. We finally analyze the overlap between layers in the network for different levels of acquaintanceships. PMID:27300084

  16. International Lunar Network (ILN) Anchor Nodes

    NASA Technical Reports Server (NTRS)

    Cohen, Barbara A.

    2009-01-01

    This slide presentation reviews the United States' contribution to the International Lunar Network (ILN) project, the Anchor Nodes project. The ILN is an initiative of 9 national space agencies to establish a set of robotic geophysical monitoring stations on the surface of the Moon. The project is aimed at furthering the understanding of the lunar composition, and interior structure.

  17. Measure of Node Similarity in Multilayer Networks.

    PubMed

    Mollgaard, Anders; Zettler, Ingo; Dammeyer, Jesper; Jensen, Mogens H; Lehmann, Sune; Mathiesen, Joachim

    2016-01-01

    The weight of links in a network is often related to the similarity of the nodes. Here, we introduce a simple tunable measure for analysing the similarity of nodes across different link weights. In particular, we use the measure to analyze homophily in a group of 659 freshman students at a large university. Our analysis is based on data obtained using smartphones equipped with custom data collection software, complemented by questionnaire-based data. The network of social contacts is represented as a weighted multilayer network constructed from different channels of telecommunication as well as data on face-to-face contacts. We find that even strongly connected individuals are not more similar with respect to basic personality traits than randomly chosen pairs of individuals. In contrast, several socio-demographics variables have a significant degree of similarity. We further observe that similarity might be present in one layer of the multilayer network and simultaneously be absent in the other layers. For a variable such as gender, our measure reveals a transition from similarity between nodes connected with links of relatively low weight to dis-similarity for the nodes connected by the strongest links. We finally analyze the overlap between layers in the network for different levels of acquaintanceships. PMID:27300084

  18. The lymph node in chronic lymphocytic leukemia.

    PubMed

    Dick, F R; Maca, R D

    1978-01-01

    Lymph nodes were examined from 41 cases of typical chronic lymphocytic leukemia (CLL). Degree of immaturity was graded as absent to minimal (Grade I), moderate (Grade II) and marked (Grade III). A moderate degree of immaturity was found in the lymph node in 14 of 41 cases even though the cells seen on the initial bone marrow and peripheral blood smears obtained from these patients were essentially all mature. The morphology of these nodes could be confused with poorly differentiated lymphocytic or mixed lymphocytic-histiocytic lymphoma in terms of the degree of immaturity present. A marked degree of immaturity present. A marked degree of immaturity was found in 5 cases; the morphology of these cases resembled histiocytic lymphoma. In the remaining 22 cases immaturity was essentially absent. The morphology of these cases was similar to that of diffuse well differentiated lymphocytic lymphoma. Our studies suggest that a moderate degree of immaturity in the lymph node of patients with CLL does not indicate that these patients will have a marked shortening of their survival. PMID:580071

  19. Use of a Hybrid Edge Node-Centroid Node Approach to Thermal Modeling

    NASA Technical Reports Server (NTRS)

    Peabody, Hume L.

    2010-01-01

    A recent proposal submitted for an ESA mission required that models be delivered in ESARAD/ESATAN formats. ThermalDesktop was the preferable analysis code to be used for model development with a conversion done as the final step before delivery. However, due to some differences between the capabilities of the two codes, a unique approach was developed to take advantage of the edge node capability of ThermalDesktop while maintaining the centroid node approach used by ESARAD. In essence, two separate meshes were used: one for conduction and one for radiation. The conduction calculations were eliminated from the radiation surfaces and the capacitance and radiative calculations were eliminated from the conduction surfaces. The resulting conduction surface nodes were coincident with all nodes of the radiation surface and were subsequently merged, while the nodes along the edges remained free. Merging of nodes on the edges of adjacent surfaces provided the conductive links between surfaces. Lastly, all nodes along edges were placed into the subnetwork and the resulting supernetwork included only the nodes associated with radiation surfaces. This approach had both benefits and disadvantages. The use of centroid, surface based radiation reduces the overall size of the radiation network, which is often the most computationally intensive part of the modeling process. Furthermore, using the conduction surfaces and allowing ThermalDesktop to calculate the conduction network can save significant time by not having to manually generate the couplings. Lastly, the resulting GMM/TMM models can be exported to formats which do not support edge nodes. One drawback, however, is the necessity to maintain two sets of surfaces. This requires additional care on the part of the analyst to ensure communication between the conductive and radiative surfaces in the resulting overall network. However, with more frequent use of this technique, the benefits of this approach can far outweigh the

  20. IDIS Small Bodies and Dust Node

    NASA Astrophysics Data System (ADS)

    de Sanctis, M. C.; Capria, M. T.; Carraro, F.; Fonte, S.; Giacomini, L.; Turrini, D.

    2009-04-01

    The EuroPlaNet information service provides access to lists of researchers, laboratories and data archives relevant to many aspects of planetary and space physics. Information can be accessed through EuroPlaNet website or, for advanced searches, via web-services available at the different thematic nodes. The goal of IDIS is to provide easy-to-use access to resources like people, laboratories, modeling activities and data archives related to planetary sciences. The development of IDIS is an international effort started under the European Commission's 6th Framework Programme and which will expand its capabilities during the 7th Framework Programme, as part of the Capacities Specific Programme/Research Infrastructures. IDIS is complemented by a set of other EuroPlaNet web-services maintained under the responsibility of separate institutions. Each activity maintains its own web-portal with cross-links pointing to the other elements of EuroPlaNet. General access is provided via the EuroPlaNet Homepage. IDIS is not a repository of original data but rather supports the access to various data sources. The final goal of IDIS is to provide Virtual Observatory tools for the access to data from laboratory measurements and ground- and spaced-based observations to modeling results, allowing the combination of as divergent data sources as feasible. IDIS is built around four scientific nodes located in different European countries. Each node deals with a subset of the disciplines related to planetary sciences and, working in cooperation with international experts in these fields, provides a wealth of information to the international planetary science community. The EuroPlaNet IDIS thematic node "Small Bodies and Dust Node" is hosted by the Istituto di Fisica dello Spazio Interplanetario and is established in close cooperation with the Istituto di Astrofisica Spaziale. Both these institutes are part of the Istituto Nazionale di Astrofisica (INAF). The IDIS Small Bodies and Dust

  1. Iterative resource allocation based on propagation feature of node for identifying the influential nodes

    NASA Astrophysics Data System (ADS)

    Zhong, Lin-Feng; Liu, Jian-Guo; Shang, Ming-Sheng

    2015-10-01

    The identification of the influential nodes in networks is one of the most promising domains. In this paper, we present an improved iterative resource allocation (IIRA) method by considering the centrality information of neighbors and the influence of spreading rate for a target node. Comparing with the results of the Susceptible Infected Recovered (SIR) model for four real networks, the IIRA method could identify influential nodes more accurately than the tradition IRA method. Specially, in the Erdös network, Kendall's tau could be enhanced 23% when the spreading rate is 0.12. In the Protein network, Kendall's tau could be enhanced 24% when the spreading rate is 0.08.

  2. Node link stability in wireless mobile networks

    NASA Astrophysics Data System (ADS)

    Hökelek, İbrahim; Uyar, M. Ümit; Fecko, Mariusz A.

    2006-05-01

    This paper presents an improvement of a novel analytic model for ad hoc networks based on Markov chains whose states represent node degree and the number of link failures. The model divides a geographic area into logical hexagonal cells, where random walk with probabilistic state-transition matrix determines link creation/failure. We can thus compute two important metrics characterizing the dynamics of a node's random movement: the expected times for the number of link changes to drop below and for the node degree to exceed a threshold. We obtained the two-dimensional Markov chain that allows us to apply these two metrics as the selection rules for the virtual backbone formation algorithm. Hence, our model is used to analyze the performance of service discovery architectures based on virtual backbone in mobile ad-hoc networks. We also plan to extend the created modeling framework to derive a number of additional metrics that characterize network connectivity, capacity, and survivability. Because the model is capable of computing the dynamics and the expected value of the number of a node's neighbors, it can also be used to estimate the level of interference as well as achievable and sustainable routing path diversity, degree of network connectivity, and the stability of routing tables. We expect to apply our modeling framework to analytic assessment of the stability of routing domains. The rate and expected values at which the nodes move in and out of domains characterize the rate of degradation of optimally built routing domains, and hence the resulting routing scalability and overhead.

  3. Validation of the Actigraph GT3X and ActivPAL Accelerometers for the Assessment of Sedentary Behavior

    ERIC Educational Resources Information Center

    Kim, Youngdeok; Barry, Vaughn W.; Kang, Minsoo

    2015-01-01

    This study examined (a) the validity of two accelerometers (ActiGraph GT3X [ActiGraph LLC, Pensacola, FL, USA] and activPAL [PAL Technologies Ltd., Glasgow, Scotland]) for the assessment of sedentary behavior; and (b) the variations in assessment accuracy by setting minimum sedentary bout durations against a proxy for direct observation using an…

  4. Enhancement of magnetic moment in ZnxFe3-xO4 thin films with dilute Zn substitution

    NASA Astrophysics Data System (ADS)

    Yuan, Honglei; Liu, Er; Yin, Yuli; Zhang, Wen; Wong, P. K. Johnny; Zheng, Jian-Guo; Huang, Zhaocong; Ou, Huiling; Zhai, Ya; Xu, Qingyu; Du, Jun; Zhai, Hongru

    2016-06-01

    Highly (111)-textured ZnxFe3-xO4 thin films were grown by pulsed laser deposition on silicon substrates. The spin and orbital magnetic moments of the ZnxFe3-xO4 thin films have been obtained by X-ray magnetic circular dichroism (XMCD) and sum rule analysis. The total magnetic moments thus extracted are in good agreement with the values obtained by vibrating sample magnetometer. Both the unquenched orbital moment and the ratio of orbital-to-spin moment first increase significantly with increasing Zn substitution at a low concentration range ( 0 ≤x ≤0.1 ), and then decrease at a higher concentration (x = 0.3). The underlying site-specific doping mechanisms involved here have been elucidated by detailed analysis of the XMCD of ZnxFe3-xO4 films. Our work demonstrates a practical means to manipulate the spin-orbit coupling in the ZnxFe3-xO4 thin films via Zn impurity doping.

  5. Growth and characterization of molecular beam epitaxy-grown Bi2Te3-xSex topological insulator alloys

    NASA Astrophysics Data System (ADS)

    Tung, Y.; Chiang, Y. F.; Chong, C. W.; Deng, Z. X.; Chen, Y. C.; Huang, J. C. A.; Cheng, C.-M.; Pi, T.-W.; Tsuei, K.-D.; Li, Z.; Qiu, H.

    2016-02-01

    We report a systematic study on the structural and electronic properties of Bi2Te3-xSex topological insulator alloy grown by molecular beam epitaxy (MBE). A mixing ratio of Bi2Se3 to Bi2Te3 was controlled by varying the Bi:Te:Se flux ratio. X-ray diffraction and Raman spectroscopy measurements indicate the high crystalline quality for the as-grown Bi2Te3-xSex films. Substitution of Te by Se is also revealed from both analyses. The surfaces of the films exhibit terrace-like quintuple layers and their size of the characteristic triangular terraces decreases monotonically with increasing Se content. However, the triangular terrace structure gradually recovers as the Se content further increases. Most importantly, the angle-resolved photoemission spectroscopy results provide evidence of single-Dirac-cone like surface states in which Bi2Te3-xSex with Se/Te-substitution leads to tunable surface states. Our results demonstrate that by fine-tuned MBE growth conditions, Bi2Te3-xSex thin film alloys with tunable topological surface states can be obtained, providing an excellent platform for exploring the novel device applications based on this compound.

  6. 3xTgAD mice exhibit altered behavior and elevated Aβ after chronic mild social stress

    PubMed Central

    Rothman, Sarah M.; Herdener, Nathan; Camandola, Simonetta; Texel, Sarah J.; Mughal, Mohamed R.; Cong, Wei-Na; Martin, Bronwen; Mattson, Mark P

    2014-01-01

    Chronic stress may be a risk factor for developing Alzheimer’s disease (AD), but most studies of the effects of stress in models of AD utilize acute adverse stressors of questionable clinical relevance. The goal of this work was to determine how chronic psychosocial stress affects behavioral and pathological outcomes in an animal model of AD, and to elucidate underlying mechanisms. A triple-transgenic mouse model of AD (3xTgAD mice) and nontransgenic control mice were used to test for an affect of chronic mild social stress on blood glucose, plasma glucocorticoids, plasma insulin, anxiety and hippocampal Aβ, ptau and BDNF levels. Despite the fact that both control and 3xTgAD mice experienced rises in corticosterone during episodes of mild social stress, at the end of the 6 week stress period 3xTgAD mice displayed increased anxiety, elevated levels of Aβ oligomers and intraneuronal Aβ, and decreased BDNF levels, whereas control mice did not. Findings suggest 3xTgAD mice are more vulnerable than control mice to chronic psychosocial stress, and that such chronic stress exacerbates Aβ accumulation and impairs neurotrophic signaling. PMID:21855175

  7. Simultaneous triple 914 nm, 1084 nm, and 1086 nm operation of a diode-pumped Nd:YVO4 laser

    NASA Astrophysics Data System (ADS)

    Lü, Yanfei; Xia, Jing; Liu, Huilong; Pu, Xiaoyun

    2014-10-01

    We report a diode-pumped continuous-wave (cw) triple-wavelength Nd:YVO4 laser operating at 914, 1084, and 1086 nm. A theoretical analysis has been introduced to determine the threshold conditions for simultaneous triple-wavelength laser. Using a T-shaped cavity, we realized an efficient triple-wavelength operation at 4F3/2→4I9/2 and 4F3/2→4I11/2 transitions for Nd:YVO4 crystal, simultaneously. At an absorbed pump power of 16 W (or 25 W of incident pump power), the maximum output power was 2.3 W, which included 914 nm, 1084 nm, and 1086 nm three wavelengths, and the optical conversion efficiency with respect to the absorbed pump power was 14.4%.

  8. Boson localization and universality in YBa2Cu(3-x)M(x)O(7-delta)

    NASA Technical Reports Server (NTRS)

    Kallio, A.; Apaja, V.; Poykko, S.

    1995-01-01

    We consider a two component mixture of charged fermions on neutralizing background with all sign combinations and arbitrarily small mass ratios. In the two impurity limit for the heavier component we show that the pair forms a bound state for all charge combinations. In the lowest order approximation we derive a closed form expression Veff(r) for the binding potential which has short-range repulsion followed by attraction. In the classical limit, when the mass of embedded particles is large m2 much greater than m, we can calculate from Veff(r) also the cohesive energy E and the bond length R of a metallic crystal such as lithium. The lowest order result is R = 3.1 A, E = -0.9 eV, not entirely different from the experimental result for lithium metal. The same interaction for two holes on a parabolic band with m2 greater than m gives the quantum mechanical bound state which one may interpret as a boson or local pair in the case of high-Te and heavy fermion superconductors. We also show that for compounds of the type YBa2Cu(3 - x)M(x)O(7 - delta) one can understand most of the experimental results for the superconducting and normal states with a single temperature dependent boson breaking function f(T) for each impurity content x governing the decay of bosons into pairing fermions. In the normal state f(T) turns out to be a linear, universal function, independent of the impurity content I and the oxygen content delta. We predict with universality a depression in Tc(x) with slight down bending in agreement with experiment. As a natural consequence of the model the bosons become localized slightly above Tc due to the Wigner crystallization, enhanced with lattice local field minima. The holes remain delocalized with a linearly increasing concentration in the normal state, thus explaining the rising Hall density. The boson localization temperature T(sub BL) shows up as a minimum in the Hall density R(sub ab)(exp -1). We also give explanation for very recently observed

  9. 0.33-k1 ArF lithography for 100-nm DRAM

    NASA Astrophysics Data System (ADS)

    Bok, Cheol-Kyu; Kim, Seok-Kyun; Kim, Hee-Bom; Oh, Jin-Sung; Ahn, Chang-Nam; Shin, Ki-Soo

    2002-07-01

    We have evaluated 0.33k1 ArF lithography using 0.63NA scanner to develop 100 nm DRAM. ArF resist problems were resist pattern shrinkage during CD SEM measurement, resist pattern collapse during wet development and poor etch resistance. Off-Site Measurement (OSM) method has been developed for decreasing pattern shrinkage. With OSM method, 8nm of CD shrinkage was down to 2nm for 100nm L/S patterns. We have found a proper BARC material that prevents resist patterns falling down. Lack of etch resistance was compensated by hard mask. With W/SiN hard mask, acrylate- type resist patterns were transferred well into W/poly-Si gate patterns. We have simulated process window of critical DRAM cell patterns (isolation, gate, bit line contact, storage node) in the simple off-axis illumination (OAI) and optical proximity correction (OPC) conditions based on single exposure. Simulation results were verified by lithography tests and it turned out that 0.33k1 process was possible with exposure latitude of above 10% and focus latitude of more than 0.4 micrometers . 0.33k1 ArF lithography was successfully implemented into 100 nm DRAM with CD uniformity of 10nm (3 (sigma) ) and overlay accuracy of 30 nm (mean +3 (sigma) ). We have also evaluated double exposure technique using dipole illumination targeting 90 nm in order to see the possibility of 0.29k1 process. 0.29k1 process was also likely to be possible, although some specific improvements were recommended for the wider process window. From the simulation and resist patterning results, we believe that 0.85 NA lens will be able to extend ArF lithography into 75 nm by single exposure technology using crosspole illumination (0.33k1 process) and 65 nm by double exposure technology using dipole and crosspole illumination (0.29k1 process).

  10. Plasma immersion ion implantation for sub-22 nm node devices: FD-SOI and Tri-Gate

    SciTech Connect

    Duchaine, J.; Milesi, F.; Coquand, R.; Barraud, S.; Reboh, S.; Gonzatti, F.; Mazen, F.; Torregrosa, Frank

    2012-11-06

    Here, we present and discuss the electrical characteristics of fully depleted MOSFET transistors of planar and tridimensional architecture, doped by Plasma Immersion Ion Implantation (PIII) or Beam Line Ion Implantation (BLII). Both techniques delivered similar and satisfactory results in considering the planar architecture. For tri-dimensional Tri-Gate transistors, the results obtained with PIII are superior.

  11. Dirac-node arc in the topological line-node semimetal HfSiS

    NASA Astrophysics Data System (ADS)

    Takane, D.; Wang, Zhiwei; Souma, S.; Nakayama, K.; Trang, C. X.; Sato, T.; Takahashi, T.; Ando, Yoichi

    2016-09-01

    We have performed angle-resolved photoemission spectroscopy on HfSiS, which has been predicted to be a topological line-node semimetal with square Si lattice. We found a quasi-two-dimensional Fermi surface hosting bulk nodal lines, alongside the surface states at the Brillouin-zone corner exhibiting a sizable Rashba splitting and band-mass renormalization due to many-body interactions. Most notably, we discovered an unexpected Dirac-like dispersion extending one dimensionally in k space—the Dirac-node arc—near the bulk node at the zone diagonal. These novel Dirac states reside on the surface and could be related to hybridizations of bulk states, but currently we have no explanation for its origin. This discovery poses an intriguing challenge to the theoretical understanding of topological line-node semimetals.

  12. Sub-10 nm nanopantography

    SciTech Connect

    Tian, Siyuan Donnelly, Vincent M. E-mail: economou@uh.edu; Economou, Demetre J. E-mail: economou@uh.edu; Ruchhoeft, Paul

    2015-11-09

    Nanopantography, a massively parallel nanopatterning method over large areas, was previously shown to be capable of printing 10 nm features in silicon, using an array of 1000 nm-diameter electrostatic lenses, fabricated on the substrate, to focus beamlets of a broad area ion beam on selected regions of the substrate. In the present study, using lens dimensional scaling optimized by computer simulation, and reduction in the ion beam image size and energy dispersion, the resolution of nanopantography was dramatically improved, allowing features as small as 3 nm to be etched into Si.

  13. Fabrication of 10nm diameter carbon nanopores

    SciTech Connect

    Radenovic, Aleksandra; Trepagnier, Eliane; Csencsits, Roseann; Downing, Kenneth H; Liphardt, Jan

    2008-09-25

    The addition of carbon to samples, during imaging, presents a barrier to accurate TEM analysis, the controlled deposition of hydrocarbons by a focused electron beam can be a useful technique for local nanometer-scale sculpting of material. Here we use hydrocarbon deposition to form nanopores from larger focused ion beam (FIB) holes in silicon nitride membranes. Using this method, we close 100-200nm diameter holes to diameters of 10nm and below, with deposition rates of 0.6nm per minute. I-V characteristics of electrolytic flow through these nanopores agree quantitatively with a one dimensional model at all examined salt concentrations.

  14. Laser Damage Growth in Fused Silica with Simultaneous 351 nm and 1053 nm irradiation

    SciTech Connect

    Norton, M A; Carr, A V; Carr, C W; Donohue, E E; Feit, M D; Hollingsworth, W G; Liao, Z; Negres, R A; Rubenchik, A M; Wegner, P J

    2008-10-24

    Laser-induced growth of optical damage often determines the useful lifetime of an optic in a high power laser system. We have extended our previous work on growth of laser damage in fused silica with simultaneous 351 nm and 1053 nm laser irradiation by measuring the threshold for growth with various ratios of 351 nm and 1053 nm fluence. Previously we reported that when growth occurs, the growth rate is determined by the total fluence. We now find that the threshold for growth is dependent on both the magnitude of the 351 nm fluence as well as the ratio of the 351 nm fluence to the 1053 nm fluence. Furthermore, the data suggests that under certain conditions the 1053 nm fluence does not contribute to the growth.

  15. Effectiveness of benzoporphyrin derivative monoacid (BPD-MA) and fiberoptic sensor in detecting metastatic neoplasm in lymph nodes in rats

    NASA Astrophysics Data System (ADS)

    Vari, Sandor G.; Pergadia, Vani R.; Wolfson, David; Thomas, Reem; Stavridi, Marigo; Snyder, Wendy J.; Fishbein, Michael C.; Papaioannou, Thanassis; Shapiro, L.; Grundfest, Warren S.

    1994-01-01

    An intensity ration of the photosensitizing agent to the natural fluorescence was used to determine the condition of lymph nodes (normal, inflammatory, or with metastases). Eighty- one Lobund Wistar rats were inoculated with Pollard rat adenocarcinoma cells. After 40 days the rats were injected with 0.75 mg/kg BPD-MA. A helium-cadmium lasers (442 nm) was used for both light delivery ad fluorescence acquisition. Fluorescence spectra were acquired and analyzed by an optical multichannel analyzer 9 EG&G, OMA III). Unbalanced repeated measures analysis of variance (ANOVA) was done on the mean intensity ratio according to location. Several locations recorded for each rat were modeled as the repeated variable. The fluorescence signal obtained from lymph nodes with metastases indicated high drug amounts, greater than in the skin, tumors, and all other tissues. The lowest fluorescence intensity ratios were observed in the skin. This leads us to the conclusion that the amount of Photofrin porfimer sodium and BPD-MA which localized in the metastatic lymph nodes is higher than in tumor and all other healthy tissues. Among normal lymph nodes there were significant differences according to the site of the node, with the left iliac lymph nodes having higher IR values than either the mesenteric (MC I or MC II) nodes. The geometric means of IR are consistently higher in normal as compared to inflammatory nodes for each location. The optical biopsy needle with laser-induced fluorescence detection and exogenic fluorochrome is a sensitive, novel techniques to localize small boundaries of metastatic neoplasm in lymph nodes.

  16. [Lymph node staging in gastrointestinal cancer. Combination of methylene blue-assisted lymph node dissection and ex vivo sentinel lymph node mapping].

    PubMed

    Märkl, B; Arnholdt, H

    2012-11-01

    The histopathological lymph node staging is of crucial importance for the prognosis estimation and therapy stratification in gastrointestinal cancer. However, the recommended numbers of lymph nodes that should be evaluated are often not reached in routine practice. Methylene blue assisted lymph node dissection was introduced as a new, simple and efficient technique to improve lymph node harvest in gastrointestinal cancer. This method is inexpensive, causes no delay and needs no toxic substances. All studies performed revealed a highly significantly improved lymph node harvest in comparison to the conventional technique. Moreover, this technique can be combined with a new ex vivo sentinel lymph node mapping that for the first time is based on histological sentinel lymph node detection. The success rate of this method is similar to conventional techniques and it enables an efficient application of extended investigation methods, such as immunohistochemistry or the polymerase chain reaction.

  17. Light intensification modeling of coating inclusions irradiated at 351 and 1053 nm

    SciTech Connect

    Stolz, Christopher J.; Hafeman, Scott; Pistor, Thomas V

    2008-05-01

    Electric-field modeling provides insight into the laser damage resistance potential of nodular defects. The laser-induced damage threshold for high-reflector coatings is 13x lower at the third harmonic (351 nm) than at the first harmonic (1053 nm) wavelength. Linear and multiphoton absorption increases with decreasing wavelength, leading to a lower-third harmonic laser resistance. Electric-field effects can also be a contributing mechanism to the lower laser resistance with decreasing wavelength. For suitably large inclusions, the nodule behaves as a microlens. The diffraction-limited spot size decreases with wavelength, resulting in an increase in intensity. Comparison of electric-field finite-element simulations illustrates a 3x to 16x greater light intensification at the shorter wavelength.

  18. Advanced CDU improvement for 22nm and below

    NASA Astrophysics Data System (ADS)

    Fujiwara, Tomoharu; Toki, Tsuyoshi; Tanaka, Daishi; Kosugi, Junichi; Susa, Tomohiko; Sakasai, Naruo; Tokui, Akira

    2011-04-01

    ArF water immersion lithography is expected to be used down to the 22nm hp node or below. However, such advancements in technology nodes have led to extremely small process margins. This necessitates more accurate means of process control. CD uniformity of the photo-resist (PR) image is affected by many sources. In the case of the exposure tool-CD error on the reticle, as well as exposure dose and focus errors are the key factors. For the PR process, heterogeneity of the stacked PR film thickness, post exposure bake (PEB) plate temperature, and development have an impact. Further, the process wafer also has error sources that include under-layer uniformity and wafer flatness. Fortunately, the majority of these factors is quite stable in a volume production process and can be compensated for by adjusting exposure dose and focus in the scanner. A technique to calculate exposure dose and focus correction values simultaneously from the measured PR image feature was reported previously [1]. In addition, a demonstration of a correction loop using a neural network calculation model was reported in SPIE 2010 [2], and the corrected CD uniformity was less than 1.5 nm (3-sigma) within the wafer. In this paper, we will report the latest CD uniformity correction results achieved with the NSR-S620D ArF immersion scanner using correction values estimated by scatterometry and CD-SEM. The method of correction using CD-SEM is newly developed. A maximum of nine parameters extracted from the PR profile are used in this correction. In general, the CD variation of an isolated line pattern caused by focus error is more sensitive than that of a dense pattern. Thus, we estimate the focus error from the isolated pattern, with the dose error estimated using both isolated and dense patterns. The Nikon CDU Master then derives the optimal control parameters for each compensation function in the scanner using the exposure dose and focus correction data, and the NSR-S620D is able to control

  19. Quantitative photoacoustic assessment of ex-vivo lymph nodes of colorectal cancer patients

    NASA Astrophysics Data System (ADS)

    Sampathkumar, Ashwin; Mamou, Jonathan; Saegusa-Beercroft, Emi; Chitnis, Parag V.; Machi, Junji; Feleppa, Ernest J.

    2015-03-01

    Staging of cancers and selection of appropriate treatment requires histological examination of multiple dissected lymph nodes (LNs) per patient, so that a staggering number of nodes require histopathological examination, and the finite resources of pathology facilities create a severe processing bottleneck. Histologically examining the entire 3D volume of every dissected node is not feasible, and therefore, only the central region of each node is examined histologically, which results in severe sampling limitations. In this work, we assess the feasibility of using quantitative photoacoustics (QPA) to overcome the limitations imposed by current procedures and eliminate the resulting under sampling in node assessments. QPA is emerging as a new hybrid modality that assesses tissue properties and classifies tissue type based on multiple estimates derived from spectrum analysis of photoacoustic (PA) radiofrequency (RF) data and from statistical analysis of envelope-signal data derived from the RF signals. Our study seeks to use QPA to distinguish cancerous from non-cancerous regions of dissected LNs and hence serve as a reliable means of imaging and detecting small but clinically significant cancerous foci that would be missed by current methods. Dissected lymph nodes were placed in a water bath and PA signals were generated using a wavelength-tunable (680-950 nm) laser. A 26-MHz, f-2 transducer was used to sense the PA signals. We present an overview of our experimental setup; provide a statistical analysis of multi-wavelength classification parameters (mid-band fit, slope, intercept) obtained from the PA signal spectrum generated in the LNs; and compare QPA performance with our established quantitative ultrasound (QUS) techniques in distinguishing metastatic from non-cancerous tissue in dissected LNs. QPA-QUS methods offer a novel general means of tissue typing and evaluation in a broad range of disease-assessment applications, e.g., cardiac, intravascular

  20. Phase and magnetic properties evolutions of Y3-x(CaZr)xFe5-xO12 by the sol-gel method

    NASA Astrophysics Data System (ADS)

    Wang, Lili; Huang, Zhigao; Zhang, Huiqin; Yu, Ruibing

    2015-12-01

    In this work, Y3-x(CaZr)xFe5-xO12 (CaZr)x:YIG) were prepared by the sol-gel method. High substituted (CaZr)x:YIG nanoparticles with x up to 0.7 were obtained at 1080 °C, below the melting point of Cu electrode. The average sizes calculated by Scherrer formula decreased from 92.4 nm to 70.0 nm when the substitution amount increased from 0 to 0.7, which was consistent with the results of TEM. The sintering temperature required to form pure garnet phase increased from 690 °C to 1065 °C as the substitution amount x increased from 0 to 0.7 for probable homogeneity destruction by Ca2+ and Zr4+. The maximum saturation magnetization (Ms) of 29.8 emu/g was achieved at x=0.3. The enhancement of Ms was attributed to the quantity reduction of Fe3+ in a-site and the increase of net magnetic moment. The observed decline in Ms for the samples with x>0.3 might be attributed to the weakness of super-exchange interaction by changing the angle and length of Fe-O-Fe bonds too much. The complex variations of the coecivities (Hc) indicated the crystal structure from single domain to multiple domains as the sintering temperature increased. Comparing the properties of the samples with x=0 and 0.3, it seemed that the substitution had the influence not only on the formation temperature, but also on the critical size of single domain and the temperature of the critical size emerging.

  1. Structural and magnetic characterization of Zr-substituted magnetite (ZrxFe3-xO4, 0≤x≤1)

    NASA Astrophysics Data System (ADS)

    Gangwar, A.; Alla, S. K.; Srivastava, M.; Meena, S. S.; Prasadrao, E. V.; Mandal, R. K.; Yusuf, S. M.; Prasad, N. K.

    2016-03-01

    We report the preparation of monophasic Zr-substituted magnetite (ZrxFe3-xO4; 0≤x≤1) nanoparticles by wet chemical route. Such a report is lacking in the literature. Rietveld refinement of the X-ray diffraction (XRD) data suggests continuous decrease in the lattice parameter with increased Zr-substitutions. From TEM analysis, the size of the as synthesized particles was found to be in the range of 5-20 nm. The differential scanning calorimetry (DSC) curves for the samples with different amount of substitutions displayed considerable differences in their behaviors. The room temperature specific magnetization at 2 T has been found to decrease from 50 (x=0.2) to 41 A m2/kg (x=1.0) with increased Zr-substitution. From XRD and magnetic behavior analysis we could suggest that due to occupation of Zr4+ ions at tetrahedral and octahedral voids of Fe3O4, the amount of Fe2+ was more at octahedral site for x≤ 0.4 and at tetrahedral site for x>0.4 respectively. The ferrofluids prepared from these magnetic nanoparticles possessed good heating ability and Specific Absorption Rate (SAR) values suitable for bioapplications.

  2. Dysprosium doping induced shape and magnetic anisotropy of Fe3-xDyxO4 (x=0.01-0.1) nanoparticles

    NASA Astrophysics Data System (ADS)

    Jain, Richa; Luthra, Vandna; Gokhale, Shubha

    2016-09-01

    The effect of dysprosium doping on evolution of structural and magnetic properties of magnetite (Fe3O4) nanoparticles is reported. A standard route of co-precipitation was used for the synthesis of undoped and doped magnetite nanoparticles Fe3-xDyxO4 (x=0.0-0.1). Transmission electron microscopy (TEM) shows formation of round shaped particles with diameter in the range of 8-14 nm for undoped sample. On doping beyond x=0.01, the formation of rod like structures is initiated along with the round shaped particles. The number of rods is found to increase with increasing doping concentration. Magnetic characterization using Vibrating Sample Magnetometer (VSM) revealed doping dependent magnetic properties which can be correlated with the crystallite size as determined from X-ray diffraction (XRD). Enhancement in the saturation magnetization in the initial stages of doping can be explained on the basis of incorporation of Dy3+ ions in the inverse spinel structure at the octahedral site in place of Fe3+ ions. Subsequent decrease in saturation magnetization observed beyond x=0.03 could be attributed to precipitation of excess Dy in form of dysprosium ferrite phase.

  3. Study of magnetic behavior in hexagonal-YMn1-xFexO3 (x=0 and 0.2) nanoparticles using remanent magnetization curves

    NASA Astrophysics Data System (ADS)

    Chauhan, Samta; Singh, Amit Kumar; Srivastava, Saurabh Kumar; Chandra, Ramesh

    2016-09-01

    We have studied the magnetic behavior of YMn1-xFexO3 (x=0 and 0.2) nanoparticles synthesized by conventional solid state reaction method. The as-synthesized nanoparticles were found to have hexagonal phase with P63cm space group confirmed by X-Ray diffraction. The particle size was found to be ~70 nm as confirmed by both X-Ray diffraction and Transmission Electron Microscopy. DC magnetization and memory effect measurements imply that the h-YMnO3 nanoparticles bear a resemblance to super spin-glass state following de Almeida-Thouless like behavior which is being suppressed by Fe-doping. The Fe-doping in YMnO3 enhances the antiferromagnetic (AFM) transition temperature TN to ~79 K and induces a new magnetic state due to the surface spins which is realized as diluted antiferromagnet in a field (DAFF) as explored by the thermoremanent and isothermoremanent magnetization measured with different applied magnetic field.

  4. Composition-driven structural and magnetic transitions in mechanically activated (1-x)BiFeO3-(x)BaTiO3 solid solutions

    NASA Astrophysics Data System (ADS)

    Pikula, T.; Malesa, B.; Oleszak, D.; Karolus, M.; Surowiec, Z.; Mitsiuk, V. I.; Jartych, E.

    2016-11-01

    This work presents systematic investigations of the structure and magnetic properties of mechanically activated (1-x)BiFeO3-(x)BaTiO3solid solutions in a wide range of constituents concentration (x=0.1-0.9). X-ray diffraction and Mössbauer spectroscopy were used as complementary methods in order to control the mechanical activation process and to follow composition-driven structural transition from rhombohedral to cubic symmetry. The investigations revealed that the structural transformation proceeds for x=0.4 and is accompanied by the disappearance of magnetic ordering in the samples. Moreover, evolution of the hyperfine interactions parameters with composition of the solid solutions was discussed in details. In particular, it was shown that hyperfine magnetic field induction decreases due to decreasing energy of superexchange interaction of iron ions. For the paramagnetic samples with x≥0.4 gradual decrease of quadrupole splitting was detected. Scanning electron microscopy was used to analyze microstructure of the samples and showed that the average grain size is in the range of 200-300 nm.

  5. Brightly Luminescent and Color-Tunable Colloidal CH3NH3PbX3 (X = Br, I, Cl) Quantum Dots: Potential Alternatives for Display Technology.

    PubMed

    Zhang, Feng; Zhong, Haizheng; Chen, Cheng; Wu, Xian-gang; Hu, Xiangmin; Huang, Hailong; Han, Junbo; Zou, Bingsuo; Dong, Yuping

    2015-04-28

    Organometal halide perovskites are inexpensive materials with desirable characteristics of color-tunable and narrow-band emissions for lighting and display technology, but they suffer from low photoluminescence quantum yields at low excitation fluencies. Here we developed a ligand-assisted reprecipitation strategy to fabricate brightly luminescent and color-tunable colloidal CH3NH3PbX3 (X = Br, I, Cl) quantum dots with absolute quantum yield up to 70% at room temperature and low excitation fluencies. To illustrate the photoluminescence enhancements in these quantum dots, we conducted comprehensive composition and surface characterizations and determined the time- and temperature-dependent photoluminescence spectra. Comparisons between small-sized CH3NH3PbBr3 quantum dots (average diameter 3.3 nm) and corresponding micrometer-sized bulk particles (2-8 μm) suggest that the intense increased photoluminescence quantum yield originates from the increase of exciton binding energy due to size reduction as well as proper chemical passivations of the Br-rich surface. We further demonstrated wide-color gamut white-light-emitting diodes using green emissive CH3NH3PbBr3 quantum dots and red emissive K2SiF6:Mn(4+) as color converters, providing enhanced color quality for display technology. Moreover, colloidal CH3NH3PbX3 quantum dots are expected to exhibit interesting nanoscale excitonic properties and also have other potential applications in lasers, electroluminescence devices, and optical sensors. PMID:25824283

  6. Scheduling applications for execution on a plurality of compute nodes of a parallel computer to manage temperature of the nodes during execution

    DOEpatents

    Archer, Charles J; Blocksome, Michael A; Peters, Amanda E; Ratterman, Joseph D; Smith, Brian E

    2012-10-16

    Methods, apparatus, and products are disclosed for scheduling applications for execution on a plurality of compute nodes of a parallel computer to manage temperature of the plurality of compute nodes during execution that include: identifying one or more applications for execution on the plurality of compute nodes; creating a plurality of physically discontiguous node partitions in dependence upon temperature characteristics for the compute nodes and a physical topology for the compute nodes, each discontiguous node partition specifying a collection of physically adjacent compute nodes; and assigning, for each application, that application to one or more of the discontiguous node partitions for execution on the compute nodes specified by the assigned discontiguous node partitions.

  7. [Genetic predictors of sick sinus node syndrome].

    PubMed

    Chernova, A A; Nikulina, S Iu; Tret'iakova, S S

    2013-01-01

    The article is devoted to the role of heredity in development of the sick sinus node syndrome (SSNS). We have examined 14 probands and 110 their relatives from families with idiopathic SSNS and established the role in development of hereditary SSNS of polymorphisms of the following genes: -2-adrenoreceptor, enzyme endothelial NO synthase, protein connexin 40, voltage dependent cardiac sodium channels, cardiac myosin heavy chains. We also revealed associations of clinical variants of idiopathic SSNS with genotypes of the studied genes.

  8. [Sonoelastography in differential diagnosis of thyroid nodes].

    PubMed

    Zubarev, A V; Bashilov, V P; Gazhonova, V E; Kartavykh, A A; Churkina, S O; Selivanov, E S

    2011-01-01

    The study was aimed to assess the diagnostic possibilities of the new method of sonoelastography. 68 patients with different thyroid nodes were studied. Sonoelastography increased the sensitivity of the routine ultrasound investigation from 89 to 94.8%, the specificity from the 83 to 93%, and the accuracy of the method from 76 to 89%. The method assignes the information of the structural changes of the thyroid, unavailable by the routine ultrasound investigation. PMID:21606917

  9. Running Geant on T. Node parallel computer

    SciTech Connect

    Jejcic, A.; Maillard, J.; Silva, J. ); Mignot, B. )

    1990-08-01

    AnInmos transputer-based computer has been utilized to overcome the difficulties due to the limitations on the processing abilities of event parallelism and multiprocessor farms (i.e., the so called bus-crisis) and the concern regarding the growing sizes of databases typical in High Energy Physics. This study was done on the T.Node parallel computer manufactured by TELMAT. Detailed figures are reported concerning the event parallelization. (AIP)

  10. Vulnerability of critical infrastructures : identifying critical nodes.

    SciTech Connect

    Cox, Roger Gary; Robinson, David Gerald

    2004-06-01

    The objective of this research was the development of tools and techniques for the identification of critical nodes within critical infrastructures. These are nodes that, if disrupted through natural events or terrorist action, would cause the most widespread, immediate damage. This research focuses on one particular element of the national infrastructure: the bulk power system. Through the identification of critical elements and the quantification of the consequences of their failure, site-specific vulnerability analyses can be focused at those locations where additional security measures could be effectively implemented. In particular, with appropriate sizing and placement within the grid, distributed generation in the form of regional power parks may reduce or even prevent the impact of widespread network power outages. Even without additional security measures, increased awareness of sensitive power grid locations can provide a basis for more effective national, state and local emergency planning. A number of methods for identifying critical nodes were investigated: small-world (or network theory), polyhedral dynamics, and an artificial intelligence-based search method - particle swarm optimization. PSO was found to be the only viable approach and was applied to a variety of industry accepted test networks to validate the ability of the approach to identify sets of critical nodes. The approach was coded in a software package called Buzzard and integrated with a traditional power flow code. A number of industry accepted test networks were employed to validate the approach. The techniques (and software) are not unique to power grid network, but could be applied to a variety of complex, interacting infrastructures.

  11. Sentinel Lymph Node Biopsy in Colon Cancer

    PubMed Central

    Bembenek, Andreas E.; Rosenberg, Robert; Wagler, Elke; Gretschel, Stephan; Sendler, Andreas; Siewert, Joerg-Ruediger; Nährig, Jörg; Witzigmann, Helmut; Hauss, Johann; Knorr, Christian; Dimmler, Arno; Gröne, Jörn; Buhr, Heinz-Johannes; Haier, Jörg; Herbst, Hermann; Tepel, Juergen; Siphos, Bence; Kleespies, Axel; Koenigsrainer, Alfred; Stoecklein, Nikolas H.; Horstmann, Olaf; Grützmann, Robert; Imdahl, Andreas; Svoboda, Daniel; Wittekind, Christian; Schneider, Wolfgang; Wernecke, Klaus-Dieter; Schlag, Peter M.

    2007-01-01

    Introduction: The clinical impact of sentinel lymph node biopsy (SLNB) in colon cancer is still controversial. The purpose of this prospective multicenter trial was to evaluate its clinical value to predict the nodal status and identify factors that influence these results. Methods: Colon cancer patients without prior colorectal surgery or irradiation were eligible. The sentinel lymph node (SLN) was identified intraoperatively by subserosal blue dye injection around the tumor. The SLN underwent step sections and immunohistochemistry (IHC), if classified free of metastases after routine hematoxylin and eosin examination. Results: At least one SLN (median, n = 2) was identified in 268 of 315 enrolled patients (detection rate, 85%). Center experience, lymphovascular invasion, body mass index (BMI), and learning curve were positively associated with the detection rate. The false-negative rate to identify pN+ patients by SLNB was 46% (38 of 82). BMI showed a significant association to the false-negative rate (P < 0.0001), the number of tumor-involved lymph nodes was inversely associated. If only slim patients (BMI ≤24) were investigated in experienced centers (>22 patients enrolled), the sensitivity increased to 88% (14 of 16). Moreover, 21% (30 of 141) of the patients, classified as pN0 by routine histopathology, revealed micrometastases or isolated tumor cells (MM/ITC) in the SLN. Conclusions: The contribution of SLNB to conventional nodal staging of colon cancer patients is still unspecified. Technical problems have to be resolved before a definite conclusion can be drawn in this regard. However, SLNB identifies about one fourth of stage II patients to reveal MM/ITC in lymph nodes. Further studies must clarify the clinical impact of these findings in terms of prognosis and the indication of adjuvant therapy. PMID:17522509

  12. Sinus node recovery time in the elderly.

    PubMed

    Kulbertus, H E; Leval-Rutten, F; Mary, L; Casters, P

    1975-04-01

    Measurement of the sinus node recovery time has been proposed as a diagnostic tool for recognition of the sick sinus syndrome. The latter is most frequently encountered in elderly patients with hypertension, coronary heart disease, and atherosclerosis. In order to provide normal values for the sinus node recovery time in this particular population group, atrial pacing studies were carried out in 30 subjects over 50 years of age, all with peripheral vascular disease and some with angina pectoris (10), residua of infarction (6), or hypertension (7). On stimulation, 7 patients maintained a I:I atrioventricular conduction up to the rate of 180/min. Second degree atrioventricular block developed in all other cases. On six occasions, Wenckebach's periods appeared at the relatively slow pacing rate of 120/min. The maximum postoverdrive pause ranged from 680 to 1600 ms with an average of 1100 ms plus or minus 190 (10). For each pacing speed, a correlation was found between the duration of the pause and the control intrinsic cardiac rate, longer pauses being associated with longer resting PP intervals. Beyond 120/min, the duration of the pause was seen to shorten progressively as the driving rate was increased. Finally, the behavior of the sinus node pacemaker following interruption of pacing showed individual variations. After pacing at relatively slow rates, a prompt return to near control values was consistently observed, whereas, after fast rates of driving, a phase of secondary depression developed in about one-half of the studied cases.

  13. Spaceport aurora: An orbiting transportation node

    NASA Technical Reports Server (NTRS)

    1990-01-01

    With recent announcements of the development of permanently staffed facilities on the Moon and Mars, the national space plan is in need of an infrastructure system for transportation and maintenance. A project team at the University of Houston College of Architecture and the Sasakawa International Center for Space Architecture, recently examined components for a low Earth orbit (LEO) transportation node that supports a lunar build-up scenario. Areas of investigation included identifying transportation node functions, identifying existing space systems and subsystems, analyzing variable orbits, determining logistics strategies for maintenance, and investigating assured crew return systems. The information resulted in a requirements definition document, from which the team then addressed conceptual designs for a LEO transportation node. The primary design drivers included: orbital stability, maximizing human performance and safety, vehicle maintainability, and modularity within existing space infrastructure. For orbital stability, the power tower configuration provides a gravity gradient stabilized facility and serves as the backbone for the various facility components. To maximize human performance, human comfort is stressed through zoning of living and working activities, maintaining a consistent local vertical orientation, providing crew interaction and viewing areas and providing crew return vehicles. Vehicle maintainability is accomplished through dual hangars, dual work cupolas, work modules, telerobotics and a fuel depot. Modularity is incorporated using Space Station Freedom module diameter, Space Station Freedom standard racks, and interchangeable interior partitions. It is intended that the final design be flexible and adaptable to provide a facility prototype that can service multiple mission profiles using modular space systems.

  14. Simplified Dynamic Analysis of Grinders Spindle Node

    NASA Astrophysics Data System (ADS)

    Demec, Peter

    2014-12-01

    The contribution deals with the simplified dynamic analysis of surface grinding machine spindle node. Dynamic analysis is based on the use of the transfer matrix method, which is essentially a matrix form of method of initial parameters. The advantage of the described method, despite the seemingly complex mathematical apparatus, is primarily, that it does not require for solve the problem of costly commercial software using finite element method. All calculations can be made for example in MS Excel, which is advantageous especially in the initial stages of constructing of spindle node for the rapid assessment of the suitability its design. After detailing the entire structure of spindle node is then also necessary to perform the refined dynamic analysis in the environment of FEM, which it requires the necessary skills and experience and it is therefore economically difficult. This work was developed within grant project KEGA No. 023TUKE-4/2012 Creation of a comprehensive educational - teaching material for the article Production technique using a combination of traditional and modern information technology and e-learning.

  15. PDS Lunar Data Node - Apollo Data Restoration

    NASA Astrophysics Data System (ADS)

    Schultz, Alfred B.; Williams, D. R.; Guinness, E. A.

    2009-01-01

    The Lunar Data Node (LDN) was formed under the auspices of the Planetary Data System (PDS) Geosciences (GEO) Node to restore selected Apollo data sets to a modern format. The Apollo lunar missions returned a wealth of information, including long-term (1969-1977) surface data collected by autonomous ALSEP (Apollo Lunar Surface Experiment Package) stations emplaced by the crews of the Apollo 12, 14, 15, 16, and 17 missions, surface point measurements, and orbital data. Much of the ALSEP and other surface and orbital data housed at NSSDC are in forms which are not readily usable, such as microfilm, hardcopy, and magnetic tapes with older, seldom-used formats. The LDN is prioritizing these data based on their scientific and engineering value for hazard and resource assessment and the level of effort required for archiving. Data from three experiments, X-Ray Spectrometer (XRS), Cold Cathode Ion Gage (CCIG), and Solar Wind Spectrometer (SWS), comprising eight unique data sets, have been restored and are in peer review process. The CCIG data have completed peer review and have been delivered to PDS GEO Node. We will report on progress made and plans for future data restorations.

  16. The Charles Perkins Centre's Twins Research Node.

    PubMed

    Ferreira, Lucas C; Craig, Jeffrey M; Hopper, John L; Carrick, Susan E

    2016-08-01

    Twins can help researchers disentangle the roles of genes from those of the environment on human traits, health, and diseases. To realize this potential, the Australian Twin Registry (ATR), University of Melbourne, and the Charles Perkins Centre (CPC), University of Sydney, established a collaboration to form the Twins Research Node, a highly interconnected research facility dedicated specifically to research involving twins. This collaboration aims to foster the adoption of twin designs as important tools for research in a range of health-related domains. The CPC hosted their Twins Research Node's launch seminar entitled 'Double the power of your research with twin studies', in which experienced twin researchers described how twin studies are supporting scientific discoveries and careers. The launch also featured twin pairs who have actively participated in research through the ATR. Researchers at the CPC were surveyed before the event to gauge their level of understanding and interest in utilizing twin research. This article describes the new Twins Research Node, discusses the survey's main results and reports on the launch seminar. PMID:27302367

  17. Improving spanning trees by upgrading nodes

    SciTech Connect

    Krumke, S.O.; Noltemeier, H.; Wirth, H.C.

    1997-01-16

    We study budget constrained optimal network upgrading problems. Such problems aim at finding optimal strategies for improving a network under some cost measure subject to certain budget constraints. A general problem in this setting is the following. We are given an edge weighted graph G = (V, E) where nodes represent processors and edges represent bidirectional communication links. The processor at a node v {element_of} V can be upgraded at a cost of c(v). Such an upgrade reduces the delay of each link emanating from v. The goal is to find a minimum cost set of nodes to be upgraded so that the resulting network has the best performance with respect to some measure. We consider the problem under two measures, namely, the weight of a minimum spanning tree and the bottleneck weight of a minimum bottleneck spanning tree. We present approximation and hardness results for the problem. Our results are tight to within constant factors. We also show that these approximation algorithms can be used to construct good approximation algorithms for the dual versions of the problems where there is a budget constraint on the upgrading cost and the objectives are minimum weight spanning tree and minimum bottleneck weight spanning tree respectively.

  18. Sarcoidal granuloma in cervical lymph nodes.

    PubMed

    Chen, Hsin-Chien; Kang, Bor-Hwang; Lai, Chuan-Tsai; Lin, Yaoh-Shiang

    2005-07-01

    Sarcoidosis is a multiorgan granulomatous disease, the most common head and neck manifestation of which is cervical lymphadenopathy. Only the presentation of sarcoidal granuloma in cervical lymph nodes without typical manifestations of systemic sarcoidosis poses a diagnostic difficulty. We describe the case of a 39-year-old male who had a 2-month history of a progressively increasing mass with soreness in his right neck. The biopsy from the neck mass demonstrated non-caseating epithelioid cell granuloma of the lymph nodes. The differential diagnoses of mycobacterial or fungal infections were excluded. Thoracic evaluations, including chest X-ray and high-resolution computed tomography, revealed no abnormal findings. Treatment with systemic corticosteroids resulted in improved clinical symptoms. No recurrence of the neck mass or other signs of systemic sarcoidosis were noted during 1.5 years of follow-up. Although our patient's definitive diagnosis could not be determined, the case highlights 2 important issues: sarcoidal granuloma in lymph nodes may be a precursor of sarcoidosis, even in the absence of pulmonary or other systemic involvement; and regular follow-up is recommended in such cases.

  19. Thermal behaviour, surface properties and vibrational spectroscopic studies of the synthesized Co3xNi3-3x(PO4)2·8H2O (0 ≤ x ≤ 1)

    NASA Astrophysics Data System (ADS)

    Kullyakool, Saifon; Danvirutai, Chanaiporn; Siriwong, Khatcharin; Noisong, Pittayagorn

    2013-10-01

    Co3xNi3-3x(PO4)2·8H2O (x = 1, 0.8, 0.6, 0.4, 0.2, and 0) were synthesized via simple wet chemical reaction and energy saving route method. The final decomposition products of hydrates are corresponding anhydrous tri(cobalt nickel) diphosphates. The metal and water contents of the synthesized hydrates were confirmed by AAS and TG/DTG/DTA techniques, respectively. The observed metal and water contents agree well with the formula of the title compounds. The crystal structures and lattice parameters as well as crystallite sizes of the studied compounds were determined using XRD data. The results from XRD and TG/DTG/DTA techniques confirmed that Co3xNi3-3x(PO4)2·8H2O at all ratios were the single phase. The FTIR spectra of studied compounds were recorded and assigned. The thermal behaviours of single and binary tri(cobalt nickel) diphosphate octahydrates were studied for the first time. The morphologies of the studied compounds were investigated by using the SEM technique. The micrographs of all studied compounds exhibited the thin plated morphology. The surface area and the pore size data of anhydrous forms were measured by N2 adsorption at -190 °C according to the BET method. The anhydrous forms of binary metal phosphate at x = 0.8, Co2.4Ni0.6(PO4)2, exhibits the highest surface area and expects to improve the catalytic activity.

  20. In die mask overlay control for 14nm double-patterning lithography

    NASA Astrophysics Data System (ADS)

    Chou, William; Cheng, James; Tseng, Alex C. P.; Wu, J. K.; Chang, Chin Kuei; Cheng, Jeffrey; Lee, Adder; Huang, Chain Ting; Peng, N. T.; Hsu, Simon C. C.; Yu, Chun Chi; Lu, Colbert; Yu, Julia; Craig, Peter; Pollock, Chuck; Ham, Young; McMurran, Jeff

    2015-10-01

    According to the ITRS roadmap, semiconductor industry drives the 193nm lithography to its limits, using techniques like Double Pattern Technology (DPT), Source Mask Optimization (SMO) and Inverse Lithography Technology (ILT). In terms of considering the photomask metrology, full in-die measurement capability is required for registration and overlay control with challenging specifications for repeatability and accuracy. Double patterning using 193nm immersion lithography has been adapted as the solution to enable 14nm technology nodes. The overlay control is one of the key figures for the successful realization of this technology. In addition to the various error contributions from the wafer scanner, the reticles play an important role in terms of considering lithographic process contributed errors. Accurate pattern placement of the features on reticles with a registration error below 4nm is mandatory to keep overall photomask contributions to overlay of sub 20nm logic within the allowed error budget. In this paper, we show in-die registration errors using 14nm DPT product masks, by measuring in-die overlay patterns comparing with regular registration patterns. The mask measurements are used to obtain an accurate model to predict mask contribution on wafer overlay of double patterning technology.

  1. Ultrastructural findings in lymph nodes from pigs suffering from naturally occurring postweaning multisystemic wasting syndrome.

    PubMed

    Rodriguez-Cariño, C; Segalés, J

    2009-07-01

    The aims of this study were to evaluate ultrastructural lesions in lymph nodes from postweaning multisystemic wasting syndrome (PMWS)-affected pigs and to correlate these alterations with detection of viral-like particles (VLPs). Samples of lymph nodes were taken from 4 PMWS-affected pigs and 2 healthy animals and processed by transmission electron microscopy. Significant ultrastructural alterations were only noted in PMWS-affected pigs, mainly in histiocytes and rarely in other cell types. Histiocytes showed severe swelling and proliferation of mitochondria, and proliferation and dilation of rough endoplasmic reticulum and Golgi complex. Infected histiocytes contained large numbers of intracytoplasmic inclusion (ICI) bodies with VLPs; some histiocytes also had intranuclear inclusions (INIs). Small inclusions were surrounded by double membrane, with a granular appearance or containing paracrystalline arrays; icosahedral VLPs were 8-17 nm in diameter. Large ICIs were double-membrane bounded or not and contained VLPs usually forming paracrystalline arrays. ICIs were often found next to mitochondria with severe swelling, and also inside them. INIs were not surrounded by membranes and contained virions of 10-13 nm diameter. Lymphocyte depletion was a striking finding of lymph nodes from PMWS-affected pigs. The inclusion bodies containing VLPs referred to in the present study should be classified as viral factories, suggesting that viral replication is probably a frequent event in macrophages, in which mitochondria might play a role.

  2. Hexafluoroisopropyl and trifluoromethyl carbinols in an acrylate platform for 157-nm chemically amplified resists

    NASA Astrophysics Data System (ADS)

    Jakubek, Vladimir; Robertson, Eric A., III; Abdourazak, Atteye H.; Markley, Thomas J.; Marsella, John A.; Ober, Christopher K.

    2004-05-01

    Electromagnetic radiation in the vacuum-ultraviolet (VUV) region is needed for imaging of very fine features at the 65 nm and 45 nm nodes. Photolithography using 157-nm radiation, emitted from an F2 excimer laser, is a candidate for next generation lithography. Only chemically amplified resists containing fluorinated hydrocarbons and siloxanes have the required transparency at this wavelength. We have identified hexafluoroisopropanol units as a building block for our 157-nm resist polymers. This paper reports our progress on the most recent research development for this platform. The hexafluoroisopropanol functionality, which has a pKa similar to phenol, has been used to increase the transparency of 157-nm single-layer acrylate-based resists. Our recent effort has been focused on the syntheses of new acrylate monomers with highly transparent building blocks based on trifluoroacetone. The first example, a homopolymer derived from trifluoroacetone bearing a fluorinated hemiacetal unit, has moderate transparency at 157 nm (A = 1.9 μm-1). We have also introduced a new acrylate monomer containing a trimer based on trifluoroacetone, where the 6-hydroxy group in the hemiacetal unit is substituted by a fluorine atom, with an acceptable transparency at 157 nm (A = 2.1 μm-1). Copolymers of the former monomer, derived from trifluoroacetone, and tert-butyl α-fluoroacrylate have also been prepared and showed good 248-nm lithographic performance suggesting suitability for 157-nm lithography. This paper will discuss the transparency, etch resistance and chemical properties of several fluorinated acrylate-based resists, synthesized from groups containing pendent hexafluoroisopropanol units and trimers derived from trifluoroacetone.

  3. Analysis of complex network performance and heuristic node removal strategies

    NASA Astrophysics Data System (ADS)

    Jahanpour, Ehsan; Chen, Xin

    2013-12-01

    Removing important nodes from complex networks is a great challenge in fighting against criminal organizations and preventing disease outbreaks. Six network performance metrics, including four new metrics, are applied to quantify networks' diffusion speed, diffusion scale, homogeneity, and diameter. In order to efficiently identify nodes whose removal maximally destroys a network, i.e., minimizes network performance, ten structured heuristic node removal strategies are designed using different node centrality metrics including degree, betweenness, reciprocal closeness, complement-derived closeness, and eigenvector centrality. These strategies are applied to remove nodes from the September 11, 2001 hijackers' network, and their performance are compared to that of a random strategy, which removes randomly selected nodes, and the locally optimal solution (LOS), which removes nodes to minimize network performance at each step. The computational complexity of the 11 strategies and LOS is also analyzed. Results show that the node removal strategies using degree and betweenness centralities are more efficient than other strategies.

  4. Evaluating the importance of nodes in complex networks

    NASA Astrophysics Data System (ADS)

    Liu, Jun; Xiong, Qingyu; Shi, Weiren; Shi, Xin; Wang, Kai

    2016-06-01

    Evaluating the importance of nodes for complex networks is of great significance to the research of survivability and robusticity of networks. This paper proposes an effective ranking method based on degree value and the importance of lines. It can well identify the importance of bridge nodes with lower computational complexity. Firstly, the properties of nodes that are connected to a line are used to compute the importance of the line. Then, the contribution of nodes to the importance of lines is calculated. Finally, degree of nodes and the contribution of nodes to the importance of lines are considered to rank the importance of nodes. Five real networks are used as test data. The experimental results show that our method can effectively evaluate the importance of nodes for complex networks.

  5. Symptomatic intravertebral disc herniation (Schmorl's node) in the cervical spine.

    PubMed Central

    Lipson, S J; Fox, D A; Sosman, J L

    1985-01-01

    A case of a Schmorl's node in the cervical vertebra causing neck pain is reported. An inflammatory focus was found on histological examination of Schmorl's node indicating a possible mechanism of pain production. Images PMID:4083942

  6. A complex perovskite-type oxynitride: the first photocatalyst for water splitting operable at up to 600 nm.

    PubMed

    Pan, Chengsi; Takata, Tsuyoshi; Nakabayashi, Mamiko; Matsumoto, Takao; Shibata, Naoya; Ikuhara, Yuichi; Domen, Kazunari

    2015-03-01

    One of the simplest methods for splitting water into H2 and O2 with solar energy entails the use of a particulate-type semiconductor photocatalyst. To harness solar energy efficiently, a new water-splitting photocatalyst that is active over a wider range of the visible spectrum has been developed. In particular, a complex perovskite-type oxynitride, LaMg(x)Ta(1-x)O(1+3x)N(2-3x)(x≥1/3), can be employed for overall water splitting at wavelengths of up to 600 nm. Two effective strategies for overall water splitting were developed. The first entails the compositional fine-tuning of a photocatalyst to adjust the bandgap energy and position by forming a series of LaMg(x)Ta(1-x)O(1+3x)N(2-3x) solid solutions. The second method is based on the surface coating of the photocatalyst with a layer of amorphous oxyhydroxide to control the surface redox reactions. By combining these two strategies, the degradation of the photocatalyst and the reverse reaction could be prevented, resulting in successful overall water splitting.

  7. Lymph node revealing solution: a new method for detection of minute axillary lymph nodes in breast cancer specimens.

    PubMed

    Koren, R; Kyzer, S; Paz, A; Veltman, V; Klein, B; Gal, R

    1997-11-01

    The staging and prognosis of patients with breast cancer is related to the presence or absence of axillary lymph node involvement. However, in some cases no lymph nodes or too small a number of lymph nodes are revealed by the traditional method of palpating and sectioning the axillary fat. In the present study we demonstrate the usefulness of the lymph node revealing solution (LNRS) in breast cancer. Specimens from 13 patients, in whom <10 lymph nodes were identified in the axilla by the traditional method, were included in the study. After excising the lymph nodes by the traditional method, axillary tissue was immersed in LNRS for 6-12 hours. Additional lymph nodes, which stood out as white chalky nodules, were excised and processed as usual. The LNRS increased the mean number of nodes per case from 6.0+/-2.5 found by the traditional method to 12.54+/-4.61 nodes per case (p < 0.01). The size of the nodes identified by the LNRS was significantly smaller (p < 0.01) than those detected by the traditional method. The LNRS changed the lymph node stage of the disease in four of the studied cases (30%). LNRS seems to be the technique of choice for detection of axillary lymph nodes in cases where the number of detected lymph nodes by the traditional method is too small for accurate staging. PMID:9351579

  8. Sentinel Lymph Nodes for Breast Carcinoma A Paradigm Shift

    PubMed Central

    Maguire, Aoife; Brogi, Edi

    2016-01-01

    Context Sentinel lymph node biopsy has been established as the new standard of care for axillary staging in most patients with invasive breast carcinoma. Historically, all patients with a positive sentinel lymph node biopsy result underwent axillary lymph node dissection. Recent trials show that axillary lymph node dissection can be safely omitted in women with clinically node negative, T1 or T2 invasive breast cancer treated with breast-conserving surgery and whole-breast radiotherapy. This change in practice also has implications on the pathologic examination and reporting of sentinel lymph nodes. Objective To review recent clinical and pathologic studies of sentinel lymph nodes and explore how these findings influence the pathologic evaluation of sentinel lymph nodes. Data Sources Sources were published articles from peer-reviewed journals in PubMed (US National Library of Medicine) and published guidelines from the American Joint Committee on Cancer, the Union for International Cancer Control, the American Society of Clinical Oncology, and the National Comprehensive Cancer Network. Conclusions The main goal of sentinel lymph node examination should be to detect all macrometastases (>2 mm). Grossly sectioning sentinel lymph nodes at 2-mm intervals and evaluation of one hematoxylin-eosin–stained section from each block is the preferred method of pathologic evaluation. Axillary lymph node dissection can be safely omitted in clinically node-negative patients with negative sentinel lymph nodes, as well as in a selected group of patients with limited sentinel lymph node involvement. The pathologic features of the primary carcinoma and its sentinel lymph node metastases contribute to estimate the extent of non–sentinel lymph node involvement. This information is important to decide on further axillary treatment. PMID:27472237

  9. A case of lymphangioleiomyomatosis affecting the supraclavicular lymph nodes.

    PubMed

    Kamitani, Takeshi; Yabuuchi, Hidetake; Soeda, Hiroyasu; Matsuo, Yoshio; Okafuji, Takashi; Sakai, Shuji; Hatakenaka, Masamitsu; Minami, Takahiro; Inoue, Hiromasa; Tanaka, Atsuo; Kohno, Hiroyuki; Tanaka, Michiko; Nakashima, Yutaka; Honda, Hiroshi

    2006-01-01

    The case of a 46-year-old woman with lymphangioleiomyomatosis (LAM) involving the supraclavicular, mediastinal, and pelvic lymph nodes in addition to the lungs is reported. Computed tomography incidentally revealed multiple thin-walled pulmonary cysts and low-attenuating masses in the supraclavicular, mediastinal, and retroperitoneal lymph nodes. A biopsy of the supraclavicular mass was performed and diagnosed as LAM histopathologically. The common sites of extrapulmonary LAM include retroperitoneal and mediastinal lymph nodes; however, supraclavicular lymph node involvement is extremely rare.

  10. Extreme ultraviolet patterned mask inspection performance of advanced projection electron microscope system for 11nm half-pitch generation

    NASA Astrophysics Data System (ADS)

    Hirano, Ryoichi; Iida, Susumu; Amano, Tsuyoshi; Watanabe, Hidehiro; Hatakeyama, Masahiro; Murakami, Takeshi; Suematsu, Kenichi; Terao, Kenji

    2016-03-01

    Novel projection electron microscope optics have been developed and integrated into a new inspection system named EBEYE-V30 ("Model EBEYE" is an EBARA's model code) , and the resulting system shows promise for application to half-pitch (hp) 16-nm node extreme ultraviolet lithography (EUVL) patterned mask inspection. To improve the system's inspection throughput for 11-nm hp generation defect detection, a new electron-sensitive area image sensor with a high-speed data processing unit, a bright and stable electron source, and an image capture area deflector that operates simultaneously with the mask scanning motion have been developed. A learning system has been used for the mask inspection tool to meet the requirements of hp 11-nm node EUV patterned mask inspection. Defects are identified by the projection electron microscope system using the "defectivity" from the characteristics of the acquired image. The learning system has been developed to reduce the labor and costs associated with adjustment of the detection capability to cope with newly-defined mask defects. We describe the integration of the developed elements into the inspection tool and the verification of the designed specification. We have also verified the effectiveness of the learning system, which shows enhanced detection capability for the hp 11-nm node.

  11. Preliminary Report on Oak Ridge National Laboratory Testing of Drake/ACSS/MA2/E3X

    SciTech Connect

    Irminger, Philip; King, Daniel J.; Herron, Andrew N.; Davis, Cody; Temple, Bill; Baker, Gord; Li, Zhi; Starke, Michael R.; Ollis, T. Ben

    2016-01-01

    A key to industry acceptance of a new technology is extensive validation in field trials. The Powerline Conductor Accelerated Test facility (PCAT) at Oak Ridge National Laboratory (ORNL) is specifically designed to evaluate the performance and reliability of a new conductor technology under real world conditions. The facility is set up to capture large amounts of data during testing. General Cable used the ORNL PCAT facility to validate the performance of TransPowr with E3X Technology a standard overhead conductor with an inorganic high emissivity, low absorptivity surface coating. Extensive testing has demonstrated a significant improvement in conductor performance across a wide range of operating temperatures, indicating that E3X Technology can provide a reduction in temperature, a reduction in sag, and an increase in ampacity when applied to the surface of any overhead conductor. This report provides initial results of that testing.

  12. Diluted orbital degeneracy and large orthorhombic distortions in ferrimagnetic spinel CuxMn3 -xO4

    NASA Astrophysics Data System (ADS)

    Lee, Kee Hwan; Chang, Hun; Hwang, In Yong; Chung, Jae-Ho; Kang, Hyun Wook; Kim, Su Jae; Lee, Seongsu

    2015-02-01

    We report large orthorhombic distortions in the ferrimagnetic tetragonal (c >a ) spinel CuxMn3 -xO4 stabilized by a few percent of Cu doping. The orthorhombic strains of the ferrimagnetic phases increased linearly to the doping and reached up to ɛ ≈8.2 ×10-3 for x =0.19 , which is three times larger than the saturated value under external magnetic fields. For high doping (x ≳0.17 ), the distortions first appeared in the paramagnetic phases and underwent further enhancement simultaneously with the onset of the noncollinear ferrimagnetic ordering. We present the rich magnetostructural phase diagram of CuxMn3 -xO4 , and argue that the diluted t2 orbital degeneracy of Cu2 + under tetrahedral crystal field breaks the global symmetry and triggers the orthorhombic instability inherent in Mn3O4 .

  13. Synthesis and characterization of F-doped Cs0.33WO3-xFx particles with improved near infrared shielding ability

    NASA Astrophysics Data System (ADS)

    Liu, Jingxiao; Luo, Jiayu; Shi, Fei; Liu, Suhua; Fan, Chuanyan; Xu, Qiang; Shao, Guolin

    2015-01-01

    F-doped Cs0.33WO3-xFx particles were successfully synthesized by the hydrothermal method with hydrofluoric acid as fluorine source, and a new kind of heat insulating films were prepared from dispersion of Cs0.33WO3-xFx nanoparticles in polyvinyl alcohol (PVA) aqueous solution. The effects of F doping on the crystal structure and morphology of Cs0.33WO3-xFx particles as well as the near-infrared (NIR) shielding ability and heat insulation properties of Cs0.33WO3-xFx films were investigated. The results indicated that HF acid addition could promote the formation of rod-like Cs0.33WO3-xFx particles during hydrothermal synthesis and increase the yield of Cs0.33WO3-xFx powders. Moreover, the as-prepared films from dispersion solution of Cs0.33WO3-xFx particles exhibited higher near-infrared (NIR) shielding ability and heat insulating properties than that of the undoped Cs0.33WO3 film. Particularly, the as-prepared Cs0.33WO3-xFx sample with F/W (molar ratio)=0.45 showed best NIR shielding ability and transparent heat insulating performance. The formation mechanism of nanorod-like particles and the effects of F doping on the properties of Cs0.33WO3-xFx products were discussed.

  14. Identifying node role in social network based on multiple indicators.

    PubMed

    Huang, Shaobin; Lv, Tianyang; Zhang, Xizhe; Yang, Yange; Zheng, Weimin; Wen, Chao

    2014-01-01

    It is a classic topic of social network analysis to evaluate the importance of nodes and identify the node that takes on the role of core or bridge in a network. Because a single indicator is not sufficient to analyze multiple characteristics of a node, it is a natural solution to apply multiple indicators that should be selected carefully. An intuitive idea is to select some indicators with weak correlations to efficiently assess different characteristics of a node. However, this paper shows that it is much better to select the indicators with strong correlations. Because indicator correlation is based on the statistical analysis of a large number of nodes, the particularity of an important node will be outlined if its indicator relationship doesn't comply with the statistical correlation. Therefore, the paper selects the multiple indicators including degree, ego-betweenness centrality and eigenvector centrality to evaluate the importance and the role of a node. The importance of a node is equal to the normalized sum of its three indicators. A candidate for core or bridge is selected from the great degree nodes or the nodes with great ego-betweenness centrality respectively. Then, the role of a candidate is determined according to the difference between its indicators' relationship with the statistical correlation of the overall network. Based on 18 real networks and 3 kinds of model networks, the experimental results show that the proposed methods perform quite well in evaluating the importance of nodes and in identifying the node role.

  15. Sentinel node techniques in cancer of the vulva.

    PubMed

    de Hullu, Joanne A; van der Zee, Ate G J

    2003-02-01

    The sentinel lymph node procedure, with the combined technique (preoperative lymphoscintigraphy with (99m)Technetium-labeled Nanocolloid and Patente Blue V ), is a promising staging technique for patients with vulvar cancer. The clinical implementation of the sentinel lymph node procedure and the role of additional histopathologic techniques of the sentinel lymph nodes are under investigation. PMID:12521546

  16. Sentinel node techniques in cancer of the vulva.

    PubMed

    de Hullu, Joanne A; van der Zee, Ate G J

    2003-02-01

    The sentinel lymph node procedure, with the combined technique (preoperative lymphoscintigraphy with (99m)Technetium-labeled Nanocolloid and Patente Blue V ), is a promising staging technique for patients with vulvar cancer. The clinical implementation of the sentinel lymph node procedure and the role of additional histopathologic techniques of the sentinel lymph nodes are under investigation.

  17. Retroperitoneal lymphocele formation after selective laparoscopic retroperitoneal lymph node sampling.

    PubMed

    Goh, M; Kantoff, P; Kavoussi, L R

    1994-06-01

    Laparoscopic retroperitoneal lymph node sampling is being evaluated at several institutions as a minimally invasive alternative to evaluate pathologically retroperitoneal lymph nodes in cases of clinical stage A testis tumor. We report on the development of a symptomatic lymphocele after selective laparoscopic retroperitoneal lymph node sampling.

  18. Radiation Failures in Intel 14nm Microprocessors

    NASA Technical Reports Server (NTRS)

    Bossev, Dobrin P.; Duncan, Adam R.; Gadlage, Matthew J.; Roach, Austin H.; Kay, Matthew J.; Szabo, Carl; Berger, Tammy J.; York, Darin A.; Williams, Aaron; LaBel, K.; Ingalls, James D.

    2016-01-01

    In this study the 14 nm Intel Broadwell 5th generation core series 5005U-i3 and 5200U-i5 was mounted on Dell Inspiron laptops, MSI Cubi and Gigabyte Brix barebones and tested with Windows 8 and CentOS7 at idle. Heavy-ion-induced hard- and catastrophic failures do not appear to be related to the Intel 14nm Tri-Gate FinFET process. They originate from a small (9 m 140 m) area on the 32nm planar PCH die (not the CPU) as initially speculated. The hard failures seem to be due to a SEE but the exact physical mechanism has yet to be identified. Some possibilities include latch-ups, charge ion trapping or implantation, ion channels, or a combination of those (in biased conditions). The mechanism of the catastrophic failures seems related to the presence of electric power (1.05V core voltage). The 1064 nm laser mimics ionization radiation and induces soft- and hard failures as a direct result of electron-hole pair production, not heat. The 14nm FinFET processes continue to look promising for space radiation environments.

  19. 810nm, 980nm, 1470nm and 1950nm diode laser comparison: a preliminary "ex vivo" study on oral soft tissues

    NASA Astrophysics Data System (ADS)

    Fornaini, Carlo; Merigo, Elisabetta; Sozzi, Michele; Selleri, Stefano; Vescovi, Paolo; Cucinotta, Annamaria

    2015-02-01

    The introduction of diode lasers in dentistry has several advantages, mainly consisting on the reduced size, reduced cost and possibility to beam delivering by optical fibers. At the moment the two diode wavelengths normally utilized in the dental field are 810 and 980 nm for soft tissues treatments. The aim of this study was to compare the efficacy of four different diode wavelengths: 810, 980, 1470 and 1950 nm diode laser for the ablation of soft tissues. Several samples of veal tongue were exposed to the four different wavelengths, at different fluences. The internal temperature of the soft tissues, in the area close to the beam, was monitored with thermocouple during the experiment. The excision quality of the exposed samples have been characterized by means of an optical microscope. Tissue damages and the cut regularity have been evaluated on the base of established criteria. The lowest thermal increase was recorded for 1950 nm laser. Best quality and speed of incision were obtained by the same wavelength. By evaluating epithelial, stromal and vascular damages for all the used wavelengths, the best result, in terms of "tissue respect", have been obtained for 1470 and 1950 nm exposures. From the obtained results 1470 and 1950 nm diode laser showed to be the best performer wavelengths among these used in this "ex vivo" study, probably due to their greatest affinity to water.

  20. Early and sustained altered expression of aging-related genes in young 3xTg-AD mice

    PubMed Central

    Gatta, V; D'Aurora, M; Granzotto, A; Stuppia, L; Sensi, S L

    2014-01-01

    Alzheimer's disease (AD) is a multifactorial neurological condition associated with a genetic profile that is still not completely understood. In this study, using a whole gene microarray approach, we investigated age-dependent gene expression profile changes occurring in the hippocampus of young and old transgenic AD (3xTg-AD) and wild-type (WT) mice. The aim of the study was to assess similarities between aging- and AD-related modifications of gene expression and investigate possible interactions between the two processes. Global gene expression profiles of hippocampal tissue obtained from 3xTg-AD and WT mice at 3 and 12 months of age (m.o.a.) were analyzed by hierarchical clustering. Interaction among transcripts was then studied with the Ingenuity Pathway Analysis (IPA) software, a tool that discloses functional networks and/or pathways associated with sets of specific genes of interest. Cluster analysis revealed the selective presence of hundreds of upregulated and downregulated transcripts. Functional analysis showed transcript involvement mainly in neuronal death and autophagy, mitochondrial functioning, intracellular calcium homeostasis, inflammatory response, dendritic spine formation, modulation of synaptic functioning, and cognitive decline. Thus, overexpression of AD-related genes (such as mutant APP, PS1, and hyperphosphorylated tau, the three genes that characterize our model) appears to favor modifications of additional genes that are involved in AD development and progression. The study also showed overlapping changes in 3xTg-AD at 3 m.o.a. and WT mice at 12 m.o.a., thereby suggesting altered expression of aging-related genes that occurs earlier in 3xTg-AD mice. PMID:24525730

  1. Morphological and magnetic study of CaMnO{sub 3-x} oxides obtained from different routes

    SciTech Connect

    Gil de Muro, Izaskun; Insausti, Maite; Lezama, Luis; Rojo, Teofilo . E-mail: qiproapt@lg.ehu.es

    2005-03-15

    The CaMnO{sub 3-x} (x=0 and 0.02) mixed oxide was synthesised from both thermal treatment of a metallo-organic precursor and ceramic method. The morphology of the different products is clearly different. The samples exhibit antiferromagnetic ordering with T{sub N} near to 120K and a weak ferromagnetic component above T{sub N}. This is slightly stronger in the phase prepared by the ceramic route.

  2. [Zn 3+ xV 2- xO 7-3 x(OH) 2+3 x]ṡ2H 2O and M[Zn 3- xV 2O 7(OH) 2]Cl 1-2 xṡ( 1+2x)H 2O two families of zinc vanadates with structures related to the hexagonal structure of [Zn 3V 2O 7(OH) 2]ṡ2H 2O

    NASA Astrophysics Data System (ADS)

    Hoyos, Dora; Palacio, Luz Amparo; Paillaud, Jean-Louis; Simon-Masseron, Angélique; Guth, Jean-Louis

    2004-11-01

    [Zn 3+ xV 2- xO 7-3 x(OH) 2+3 x]ṡ2H 2O ( I), with 03- xV 2O 7(OH) 2]Cl 1-2 xṡ(1+2x)H 2O ( II), with 0.15

  3. Patterning challenges in the sub-10 nm era

    NASA Astrophysics Data System (ADS)

    Preil, Moshe E.

    2016-03-01

    Historically, progress in lithography has been driven by steady advances in exposure tool and optical technology; shorter wavelength, higher numerical aperture (NA) and resolution enhancement techniques to drive the k1 factor as close as possible to the physical limit. Over the past decade, however, the pace of progress has been gated more by patterning - what we do after the resist image is printed - than by higher resolution imaging. The emphasis on patterning rather than just printing has created new pressures in many parts of the overall process, beginning with the design itself. The breakdown of lithographic error budgets into CD and OL tolerances has given way to total edge placement error (EPE) budgets where CD, OL and edge roughness, as well as film and etch variations, must all be controlled to meet the required tolerances. Contact hole and cut mask placement have likewise been tightened to single digit EPE budgets. Collaborative research between technology specialists in multiple areas, such as metrology, etch, process control and simulation, will all be required to deliver these patterning solutions for some years to come. This paper will describe some of these challenges in more detail, and suggest directions for future research to keep optical lithography relevant even below the 10 nm node.

  4. Analysis of wafer heating in 14nm DUV layers

    NASA Astrophysics Data System (ADS)

    Subramany, Lokesh; Chung, Woong Jae; Samudrala, Pavan; Gao, Haiyong; Aung, Nyan; Gomez, Juan Manuel; Minghetti, Blandine; Lee, Shawn

    2016-03-01

    To further shrink the contact and trench dimensions, Negative Tone Development (NTD) has become the de facto process at these layers. The NTD process uses a positive tone resist and an organic solvent-based negative tone developer which leads to improved image contrast, larger process window and smaller Mask Error Enhancement Factor (MEEF)[1]. The NTD masks have high transmission values leading to lens heating and as observed here wafer heating as well. Both lens and wafer heating will contribute to overlay error, however the effects of lens heating can be mitigated by applying lens heating corrections while no such corrections exist for wafer heating yet. Although the magnitude of overlay error due to wafer heating is low relative to lens heating; ever tightening overlay requirements imply that the distortions due to wafer heating will quickly become a significant part of the overlay budget. In this work the effects, analysis and observations of wafer heating on contact and metal layers of the 14nm node are presented. On product wafers it manifests as a difference in the scan up and scan down signatures between layers. An experiment to further understand wafer heating is performed with a test reticle that is used to monitor scanner performance.

  5. Giant planar Hall effect in reactive sputtered epitaxial CrxFe3-xO4 films

    NASA Astrophysics Data System (ADS)

    Li, P.; Cui, W. Y.; Jin, C.; Bai, H. L.

    2014-09-01

    The epitaxial CrxFe3-xO4 films were fabricated by dc reactive sputtering on MgO (001) substrates. The longitudinal resistivity ρxx was enhanced 3 orders of magnitude with the increase of Cr content x from 0 to 0.87. The tunneling magnetoresistance like planar Hall effect in the CrxFe3-xO4 films was observed while the angle between ⟨100⟩ in (001) oriented films and the direction of magnetic field is 45° and 135°, respectively. Both the phase relation of angular dependent planar Hall resistivity ρxy and the numeral relation of ρxy with longitudinal resistivity difference ρ//-ρ⊥ cannot be understood by the planar Hall effect expression in isotropic magnetic medium. The largest planar Hall resistivity was ˜105 μΩ cm for x = 0.71, which is one, two, and six orders of magnitude larger than that in Fe3O4, GaMnAs, and ferromagnetic metals, respectively. The giant planar Hall resistivity ρxy is weak saturated at high fields and increases with the magnetic field. This giant planar Hall effect in the highly resistive CrxFe3-xO4 films is closely correlated to the longitudinal resistivity and antiphase boundaries.

  6. Multiband nodeless superconductivity near the charge-density-wave quantum critical point in ZrTe3-x Se x

    NASA Astrophysics Data System (ADS)

    Shan, Cui; Lan-Po, He; Xiao-Chen, Hong; Xiang-De, Zhu; Cedomir, Petrovic; Shi-Yan, Li

    2016-07-01

    It was found that selenium doping can suppress the charge-density-wave (CDW) order and induce bulk superconductivity in ZrTe3. The observed superconducting dome suggests the existence of a CDW quantum critical point (QCP) in ZrTe3-x Se x near x ≈ 0.04. To elucidate the superconducting state near the CDW QCP, we measure the thermal conductivity of two ZrTe3-x Se x single crystals (x = 0.044 and 0.051) down to 80 mK. For both samples, the residual linear term κ 0/T at zero field is negligible, which is a clear evidence for nodeless superconducting gap. Furthermore, the field dependence of κ 0/T manifests a multigap behavior. These results demonstrate multiple nodeless superconducting gaps in ZrTe3-x Se x , which indicates conventional superconductivity despite of the existence of a CDW QCP. Project supported by the National Basic Research Program of China (Grant Nos. 2012CB821402 and 2015CB921401), the National Natural Science Foundation of China (Grant Nos. 91421101, 11422429, and 11204312), the Program for Professor of Special Appointment (Eastern Scholar) at Shanghai Institutions of Higher Learning, China, and STCSM of China (Grant No. 15XD1500200). Work at Brookhaven National Laboratory was supported by the US DOE under Contract No. DESC00112704.

  7. Optimal Shape Design of Mail-Slot Nacelle on N3-X Hybrid Wing-Body Configuration

    NASA Technical Reports Server (NTRS)

    Kim, Hyoungjin; Liou, Meng-Sing

    2013-01-01

    System studies show that a N3-X hybrid wing-body aircraft with a turboelectric distributed propulsion system using a mail-slot inlet/nozzle nacelle can meet the environmental and performance goals for N+3 generation transports (three generations beyond the current air transport technology level) set by NASA's Subsonic Fixed Wing Project. In this study, a Navier-Stokes flow simulation of N3-X on hybrid unstructured meshes was conducted, including the mail-slot propulsor. The geometry of the mail-slot propulsor was generated by a CAD (Computer-Aided Design)-free shape parameterization. A novel body force model generation approach was suggested for a more realistic and efficient simulation of the flow turning, pressure rise and loss effects of the fan blades and the inlet-fan interactions. Flow simulation results of the N3-X demonstrates the validity of the present approach. An optimal Shape design of the mail-slot nacelle surface was conducted to reduce strength of shock waves and flow separations on the cowl surface.

  8. Chloride Incorporation Process in CH3NH3PbI3-xClx Perovskites via Nanoscale Bandgap Maps

    PubMed Central

    Chae, Jungseok; Dong, Qingfeng; Huang, Jinsong; Centrone, Andrea

    2016-01-01

    CH3NH3PbI3-xClx perovskites enable fabrication of highly efficient solar cells. Chloride ions benefit the morphology, carrier diffusion length and stability of perovskite films; however, whether those benefits stem from the presence of Cl− in the precursor solution or from their incorporation in annealed films is debated. In this work, the photothermal induced resonance (PTIR), an in situ technique with nanoscale resolution, is leveraged to measure the bandgap of CH3NH3PbI3-xClx films obtained by a multicycle coating process that produces high efficiency (≈ 16 %) solar cells. Because chloride ions modify the perovskite lattice, thereby widening the bandgap, measuring the bandgap locally yields the local chloride content. After a mild annealing (60 min, 60°C) the films consist of Cl-rich (x < 0.3) and Cl-poor phases that, upon further annealing (110 °C), evolve into a homogenous Cl-poorer (x < 0.06) phase, suggesting that methylammonium-chrloride is progressively expelled from the film. Despite the small chloride content, CH3NH3PbI3-xClx films show better thermal stability up to 140 °C with respect CH3NH3PbI3 films fabricated with the same methodology. PMID:26528710

  9. Alzheimer therapy with an antibody against N-terminal Abeta 4-X and pyroglutamate Abeta 3-X

    PubMed Central

    Antonios, Gregory; Borgers, Henning; Richard, Bernhard C.; Brauß, Andreas; Meißner, Julius; Weggen, Sascha; Pena, Vladimir; Pillot, Thierry; Davies, Sarah L.; Bakrania, Preeti; Matthews, David; Brownlees, Janet; Bouter, Yvonne; Bayer, Thomas A.

    2015-01-01

    Full-length Aβ1-42 and Aβ1-40, N-truncated pyroglutamate Aβ3-42 and Aβ4-42 are major variants in the Alzheimer brain. Aβ4-42 has not been considered as a therapeutic target yet. We demonstrate that the antibody NT4X and its Fab fragment reacting with both the free N-terminus of Aβ4-x and pyroglutamate Aβ3-X mitigated neuron loss in Tg4-42 mice expressing Aβ4-42 and completely rescued spatial reference memory deficits after passive immunization. NT4X and its Fab fragment also rescued working memory deficits in wild type mice induced by intraventricular injection of Aβ4-42. NT4X reduced pyroglutamate Aβ3-x, Aβx-40 and Thioflavin-S positive plaque load after passive immunization of 5XFAD mice. Aβ1-x and Aβx-42 plaque deposits were unchanged. Importantly, for the first time, we demonstrate that passive immunization using the antibody NT4X is therapeutically beneficial in Alzheimer mouse models showing that N-truncated Aβ starting with position four in addition to pyroglutamate Aβ3-x is a relevant target to fight Alzheimer’s disease. PMID:26626428

  10. Alzheimer therapy with an antibody against N-terminal Abeta 4-X and pyroglutamate Abeta 3-X.

    PubMed

    Antonios, Gregory; Borgers, Henning; Richard, Bernhard C; Brauß, Andreas; Meißner, Julius; Weggen, Sascha; Pena, Vladimir; Pillot, Thierry; Davies, Sarah L; Bakrania, Preeti; Matthews, David; Brownlees, Janet; Bouter, Yvonne; Bayer, Thomas A

    2015-12-02

    Full-length Aβ1-42 and Aβ1-40, N-truncated pyroglutamate Aβ3-42 and Aβ4-42 are major variants in the Alzheimer brain. Aβ4-42 has not been considered as a therapeutic target yet. We demonstrate that the antibody NT4X and its Fab fragment reacting with both the free N-terminus of Aβ4-x and pyroglutamate Aβ3-X mitigated neuron loss in Tg4-42 mice expressing Aβ4-42 and completely rescued spatial reference memory deficits after passive immunization. NT4X and its Fab fragment also rescued working memory deficits in wild type mice induced by intraventricular injection of Aβ4-42. NT4X reduced pyroglutamate Aβ3-x, Aβx-40 and Thioflavin-S positive plaque load after passive immunization of 5XFAD mice. Aβ1-x and Aβx-42 plaque deposits were unchanged. Importantly, for the first time, we demonstrate that passive immunization using the antibody NT4X is therapeutically beneficial in Alzheimer mouse models showing that N-truncated Aβ starting with position four in addition to pyroglutamate Aβ3-x is a relevant target to fight Alzheimer's disease.

  11. Controlled Substitution of Chlorine for Iodine in Single-Crystal Nanofibers of Mixed Perovskite MAPbI3- x Clx.

    PubMed

    Zhang, Haihua; Liao, Qing; Wang, Xuedong; Hu, Ke; Yao, Jiannian; Fu, Hongbing

    2016-07-01

    Longer carrier diffusion length and improved power conversion efficiency have been reported for thin-film solar cell of organolead mixed-halide perovskite MAPbI3- x Cl x in comparison with MAPbI3 . Instead of substituting I in the MAPbI3 lattice, Cl-incorporation has been shown to mainly improve the film morphology of perovskite absorber. Well-defined crystal structure, adjustable composition (x), and regular morphology, remains a formidable task. Herein, a facile solution-assembly method is reported for synthesizing single-crystalline nanofibers (NFs) of tetragonal-lattice MAPbI3- x Cl x with the Cl-content adjustable between 0 ≤ x ≤ 0.75, leading to a gradual blueshift of the absorption and photoluminescence maxima from x = 0 to 0.75. The photoresponsivity (R) of MAPbI3 NFs keeps almost unchanging at a value independent of the white-light illumination intensity (P). In contrast, R of MAPbI3- x Cl x NFs decreases rapidly with increasing both the x and P values, indicating Cl-substitution increases the recombination traps of photogenerated free electrons and holes. This study provides a model system to examine the role of extrinsic Cl ions in both perovskite crystallography and optoelectronic properties.

  12. Controlled Substitution of Chlorine for Iodine in Single-Crystal Nanofibers of Mixed Perovskite MAPbI3- x Clx.

    PubMed

    Zhang, Haihua; Liao, Qing; Wang, Xuedong; Hu, Ke; Yao, Jiannian; Fu, Hongbing

    2016-07-01

    Longer carrier diffusion length and improved power conversion efficiency have been reported for thin-film solar cell of organolead mixed-halide perovskite MAPbI3- x Cl x in comparison with MAPbI3 . Instead of substituting I in the MAPbI3 lattice, Cl-incorporation has been shown to mainly improve the film morphology of perovskite absorber. Well-defined crystal structure, adjustable composition (x), and regular morphology, remains a formidable task. Herein, a facile solution-assembly method is reported for synthesizing single-crystalline nanofibers (NFs) of tetragonal-lattice MAPbI3- x Cl x with the Cl-content adjustable between 0 ≤ x ≤ 0.75, leading to a gradual blueshift of the absorption and photoluminescence maxima from x = 0 to 0.75. The photoresponsivity (R) of MAPbI3 NFs keeps almost unchanging at a value independent of the white-light illumination intensity (P). In contrast, R of MAPbI3- x Cl x NFs decreases rapidly with increasing both the x and P values, indicating Cl-substitution increases the recombination traps of photogenerated free electrons and holes. This study provides a model system to examine the role of extrinsic Cl ions in both perovskite crystallography and optoelectronic properties. PMID:27248518

  13. Persistence of behaviours in the Forced Swim Test in 3xTg-AD mice at advanced stages of disease.

    PubMed

    Torres-Lista, Virginia; Giménez-Llort, Lydia

    2014-07-01

    Forced Swimming Test (FST) models behavioural despair in animals by loss of motivation to respond or the refusal to escape. The present study characterizes the behavioural responses of 12-month-old male 3xTg-AD mice in FST as compared to age-matched no-transgenic (NTg) mice. Paradoxical results were consistently found from what would be expected from their BPSD (Behavioural and Psychological Symptoms of Dementia)-like profile. The comprehensive analysis of the ethogram shown in the FST considered the intervals of the test (0-2 and 2-6min), all the elicited behavioural responses (immobility, swimming and climbing) and their features (total duration, frequency of episodes and mean duration). Both genotypes showed equal number of swimming episodes and climbing attempts during the first interval, that resulted in high swimming times, short climbing and scarce immobility. Thereafter, the NTg mice showed a behavioural shift over time and the immobility response showed up. In contrast, all the measures consistently evidenced that 3xTg-AD persisted with the previous behavioural pattern. Genotype differences consisted in less number of episodes of immobility and swimming, and a low immobility time in favour of swimming. No differences were found in 'climbing' attempts. The behavioural response observed is discussed as a lack of ability of 3xTg-AD mice to shift behaviour over time that may result of poorest cognitive flexibility and copying with stress strategies more than behavioural despair per se.

  14. Characterization of natural titanomagnetites (Fe3-xTixO4) for studying heterogeneous electron transfer to Tc(VII) in the Hanford subsurface

    NASA Astrophysics Data System (ADS)

    Pearce, C. I.; Liu, J.; Baer, D. R.; Qafoku, O.; Heald, S. M.; Arenholz, E.; Grosz, A. E.; McKinley, J. P.; Resch, C. T.; Bowden, M. E.; Engelhard, M. H.; Rosso, K. M.

    2014-03-01

    Sediments with basaltic provenance, such as those at the Hanford nuclear reservation, Washington, USA, are rich in Fe-bearing minerals of mixed valence. These minerals are redox reactive with aqueous O2 or Fe(II), and have the potential to react with important environmental contaminants including Tc. Here we isolate, identify and characterize natural Fe(II)/Fe(III)-bearing microparticles from Hanford sediments, develop synthetic analogues and investigate their batch redox reactivity with aqueous Tc(VII). Natural Fe-rich mineral samples were isolated by magnetic separation from sediments collected at several locations on Hanford’s central plateau. This magnetic mineral fraction was found to represent up to 1 wt% of the total sediment, and be composed of 90% magnetite with minor ilmenite and hematite, as determined by X-ray diffraction. The magnetite contained variable amounts of transition metals consistent with alio- and isovalent metal substitutions for Fe. X-ray microprobe analysis showed that Ti was the most significant substituent, and that these grains could be described with the titanomagnetite formula Fe3-xTixO4, which falls between endmember magnetite (x = 0) and ulvöspinel (x = 1). The dominant composition was determined to be x = 0.15 by chemical analysis and electron probe microanalysis in the bulk, and by L-edge X-ray absorption spectroscopy and X-ray photoelectron spectroscopy at the surface. Site-level characterization of the titanomagnetites by X-ray magnetic circular dichroism showed that despite native oxidation, octahedral Fe(II) was detectable within 5 nm of the mineral surface. By testing the effect of contact with oxic Hanford and Ringold groundwaters to reduced Ringold groundwater, it was found that the concentration of this near-surface structural Fe(II) was strongly dependent on aqueous redox condition. This highlights the potential for restoring reducing equivalents and thus reduction capacity to oxidized Fe-mineral surfaces through

  15. Characterization of natural titanomagnetites (Fe3-xTixO4) for studying heterogeneous electron transfer to Tc(VII) in the Hanford subsurface

    SciTech Connect

    Pearce, Carolyn I.; Liu, Juan; Baer, Donald R.; Qafoku, Odeta; Heald, Steve M.; Arenholz, Elke; Grosz, Andrew E.; McKinley, James P.; Resch, Charles T.; Bowden, Mark E.; Engelhard, Mark H.; Rosso, Kevin M.

    2014-03-01

    Sediments with basaltic provenance, such as those at the Hanford nuclear reservation, Washington, USA, are rich in Fe-bearing minerals of mixed valence. These minerals are redox reactive with aqueous O2 or Fe(II), and have the potential to react with important environmental contaminants including Tc. Here we isolate, identify and characterize natural Fe(II)/Fe(III)-bearing microparticles from Hanford sediments, develop synthetic analogues and investigate their batch redox reactivity with aqueous Tc(VII). Natural Fe-rich mineral samples were isolated by magnetic separation from sediments collected at several locations on Hanford’s central plateau. This magnetic mineral fraction was found to represent up to 1 wt% of the total sediment, and be composed of 90% magnetite with minor ilmenite and hematite, as determined by X-ray diffraction. The magnetite contained variable amounts of transition metalsconsistent with alio- and isovalent metal substitutions for Fe. X-ray microprobe analysis showed that Ti was the most significant substituent, and that these grains could be described with the titanomagnetite formula Fe3_xTixO4, which falls between endmember magnetite (x = 0) and ulvo¨ spinel (x = 1). The dominant composition was determined to be x = 0.15 by chemical analysis and electron probe microanalysis in the bulk, and by L-edge X-ray absorption spectroscopy and X-ray photoelectron spectroscopy at the surface. Site-level characterization of the titanomagnetites by X-ray magnetic circular dichroism showed that despite native oxidation, octahedral Fe(II) was detectable within 5 nm of the mineral surface. By testing the effect of contact with oxic Hanford and Ringold groundwaters to reduced Ringold groundwater, it was found that the concentration of this near-surface structural Fe(II) was strongly dependent on aqueous redox condition. This highlights the potential for restoring reducing equivalents and thus reduction capacity to oxidized Fe-mineral surfaces through

  16. Diode laser (980nm) cartilage reshaping

    NASA Astrophysics Data System (ADS)

    El Kharbotly, A.; El Tayeb, T.; Mostafa, Y.; Hesham, I.

    2011-03-01

    Loss of facial or ear cartilage due to trauma or surgery is a major challenge to the otolaryngologists and plastic surgeons as the complicated geometric contours are difficult to be animated. Diode laser (980 nm) has been proven effective in reshaping and maintaining the new geometric shape achieved by laser. This study focused on determining the optimum laser parameters needed for cartilage reshaping with a controlled water cooling system. Harvested animal cartilages were angulated with different degrees and irradiated with different diode laser powers (980nm, 4x8mm spot size). The cartilage specimens were maintained in a deformation angle for two hours after irradiation then released for another two hours. They were serially measured and photographed. High-power Diode laser irradiation with water cooling is a cheep and effective method for reshaping the cartilage needed for reconstruction of difficult situations in otorhinolaryngologic surgery. Key words: cartilage,diode laser (980nm), reshaping.

  17. Resist materials for 157-nm lithography

    NASA Astrophysics Data System (ADS)

    Toriumi, Minoru; Ishikawa, Seiichi; Miyoshi, Seiro; Naito, Takuya; Yamazaki, Tamio; Watanabe, Manabu; Itani, Toshiro

    2001-08-01

    Fluoropolymers are key materials for single layer resists of 157nm lithography. We have been studying fluoropolymers to identify their potential for base resins of 157nm photoresist. Many fluoropolymers showed high optical transparencies, with absorption coefficients of 0.01micrometers -1 to 2micrometers -1 at 157nm, and dry- etching resistance comparable to an ArF resist, and non- swelling solubility in the standard developer. Positive- tone resists were formulated using fluoropolymers that fulfill practical resist requirements. They showed good sensitivities, from 1 mJ/cm(superscript 2 to 10 mJ/cm2, and contrast in the sensitivity curves. They were able to be patterned using a F2 laser microstepper.

  18. Lipid nanoparticle vectorization of indocyanine green improves fluorescence imaging for tumor diagnosis and lymph node resection.

    PubMed

    Navarro, Fabrice P; Berger, Michel; Guillermet, Stéphanie; Josserand, Véronique; Guyon, Laurent; Neumann, Emmanuelle; Vinet, Françoise; Texier, Isabelle

    2012-10-01

    Fluorescence imaging is opening a new era in image-guided surgery and other medical applications. The only FDA approved contrast agent in the near infrared is IndoCyanine Green (ICG), which despites its low toxicity, displays poor chemical and optical properties for long-term and sensitive imaging applications in human. Lipid nanoparticles are investigated for improving ICG optical properties and in vivo fluorescence imaging sensitivity. 30 nm diameter lipid nanoparticles (LNP) are loaded with ICG. Their characterization and use for tumor and lymph node imaging are described. Nano-formulation benefits dye optical properties (6 times improved brightness) and chemical stability (>6 months at 4 degrees C in aqueous buffer). More importantly, LNP vectorization allows never reported sensitive and prolonged (>1 day) labeling of tumors and lymph nodes. Composed of human-use approved ingredients, this novel ICG nanometric formulation is foreseen to expand rapidly the field of clinical fluorescence imaging applications.

  19. Comparative study of Nd:KGW lasers pumped at 808 nm and 877 nm

    NASA Astrophysics Data System (ADS)

    Huang, Ke; Ge, Wen-Qi; Zhao, Tian-Zhuo; He, Jian-Guo; Feng, Chen-Yong; Fan, Zhong-Wei

    2015-10-01

    The laser performance and thermal analysis of Nd:KGW laser continuously pumped by 808 nm and 877 nm are comparatively investigated. Output power of 670 mW and 1587 mW, with nearly TEM00 mode, are achieved respectively at 808 nm pump and 877 nm pump. Meanwhile, a high-power passively Q-switched Nd:KGW/Cr4+:YAG laser pumped at 877 nm is demonstrated. An average output power of 1495 mW is obtained at pump power of 5.22 W while the laser is operating at repetition of 53.17 kHz. We demonstrate that 877 nm diode laser is a more potential pump source for Nd:KGW lasers.

  20. Homozygosity for a novel adenosine deaminase (ADA) nonsense mutation (Q3>X) in a child with severe combined immunodeficiency (SCID)

    SciTech Connect

    Santisteban, I.; Arrendondo-Vega, F.X.; Kelly, S. |

    1994-09-01

    A Somali girl was diagnosed with ADA-deficient SCID at 7 mo; she responded well to PEG-ADA replacement and is now 3.3 yr old. ADA mRNA was undetectable (Northern) in her cultured T cells, but was present in T cells of her parents and two sibs. All PCR-amplified exon 1 genomic clones from the patient had a C>T transition at bp 7 relative to the start of translation, replacing Gln at codon 3 (AGA) with a termination codon (TGA, Q3>X). Patient cDNA (prepared by RT-PCR with a 5{prime} primer that covered codons 1-7) had a previously described polymorphism, K80>R, but was otherwise normal, indicating that no other coding mutations were present. A predicted new genomic BfaI restriction site was used to establish her homozygosity for Q3>X and to analyze genotypes of family members. We also analyzed the segregation of a variable Alu polyA-associated TAAA repeat (AluVpA) situated 5{prime} of the ADA gene. Three different AluVpA alleles were found, one of which was only present in the father and was not associated with his Q3>X allele. Because the father`s RBCs had only {approximately}15% of normal ADA activity, we analyzed his ADA cDNA. We found a G>A transition at bp 425 that substitutes Gln for Arg142, a solvent-accessible residue, and eliminates a BsmAI site in exon 5. ADA activity of the R142>Q in vitro translation product was 20-25% of wild type ADA translation product, suggesting that R142>Q is a new {open_quote}partial{close_quote} ADA deficiency mutation. As expected, Q3>X mRNA did not yield a detectable in vitro translation product. We conclude that the patient`s father is a compound heterozygote carrying the ADA Q3>X/R142>Q genotype. {open_quote}Partial{close_quote} ADA deficiency unassociated with immunodeficiency is relatively common in individuals of African descent. The present findings and previous observations suggest that {open_quote}partial{close_quote} ADA deficiency may have had an evolutionary advantage.

  1. Genetic Network Programming with Intron-Like Nodes

    NASA Astrophysics Data System (ADS)

    Mabu, Shingo; Chen, Yan; Eto, Shinji; Shimada, Kaoru; Hirasawa, Kotaro

    Recently, Genetic Network Programming (GNP) has been proposed, which is an extension of Genetic Algorithm(GA) and Genetic Programming(GP). GNP can make compact programs and can memorize the past history in it implicitly, because it expresses the solution by directed graphs and therefore, it can reuse the nodes. In this research, intron-like nodes are introduced for improving the performance of GNP. The aim of introducing intron-like nodes is to use every node as much as possible. It is found from simulations that the intron-like nodes are useful for improving the training speed and generalization ability.

  2. Mutually connected component of networks of networks with replica nodes

    NASA Astrophysics Data System (ADS)

    Bianconi, Ginestra; Dorogovtsev, Sergey N.; Mendes, José F. F.

    2015-01-01

    We describe the emergence of the giant mutually connected component in networks of networks in which each node has a single replica node in any layer and can be interdependent only on its replica nodes in the interdependent layers. We prove that if, in these networks, all the nodes of one network (layer) are interdependent on the nodes of the same other interconnected layer, then, remarkably, the mutually connected component does not depend on the topology of the network of networks. This component coincides with the mutual component of the fully connected network of networks constructed from the same set of layers, i.e., a multiplex network.

  3. Mucoepidermoid carcinoma arising in an intraparotid lymph node.

    PubMed

    Smith, A; Winkler, B; Perzin, K H; Wazen, J; Blitzer, A

    1985-01-15

    A well-differentiated mucoepidermoid carcinoma that was confined to, and apparently arose within, an intraparotid lymph node is reported. Salivary gland ducts and acini often are found within intraparotid lymph nodes, and occasionally within extraparotid nodes. Salivary gland tumors, both benign and malignant, can develop within this ectopic salivary tissue. When a malignant salivary-gland-type neoplasm is found within an intraparotid or periparotid lymph node, the possibility exists that the tumor has arisen within the node and does not necessarily represent a metastasis from some other occult site.

  4. DSA via hole shrink for advanced node applications

    NASA Astrophysics Data System (ADS)

    Chi, Cheng; Liu, Chi-Chun; Meli, Luciana; Schmidt, Kristin; Xu, Yongan; DeSilva, Ekmini Anuja; Sanchez, Martha; Farrell, Richard; Cottle, Hongyun; Kawamura, Daiji; Singh, Lovejeet; Furukawa, Tsuyoshi; Lai, Kafai; Pitera, Jed W.; Sanders, Daniel; Hetzer, David R.; Metz, Andrew; Felix, Nelson; Arnold, John; Colburn, Matthew

    2016-04-01

    Directed self-assembly (DSA) of block copolymers (BCPs) has become a promising patterning technique for 7nm node hole shrink process due to its material-controlled CD uniformity and process simplicity.[1] For such application, cylinder-forming BCP system has been extensively investigated compared to its counterpart, lamella-forming system, mainly because cylindrical BCPs will form multiple vias in non-circular guiding patterns (GPs), which is considered to be closer to technological needs.[2-5] This technological need to generate multiple DSA domains in a bar-shape GP originated from the resolution limit of lithography, i.e. those vias placed too close to each other will merge and short the circuit. In practice, multiple patterning and self-aligned via (SAV) processes have been implemented in semiconductor manufacturing to address this resolution issue.[6] The former approach separates one pattern layer with unresolvable dense features into several layers with resolvable features, while the latter approach simply utilizes the superposition of via bars and the pre-defined metal trench patterns in a thin hard mask layer to resolve individual vias, as illustrated in Fig 1 (upper). With proper design, using DSA to generate via bars with the SAV process could provide another approach to address the resolution issue.

  5. Adaptive node techniques for Maxwell's equations

    SciTech Connect

    Hewett, D W

    2000-04-01

    The computational mesh in numerical simulation provides a framework on which to monitor the spatial dependence of function and their derivatives. Spatial mesh is therefore essential to the ability to integrate systems in time without loss of fidelity. Several philosophies have emerged to provide such fidelity (Eulerian, Lagrangian, Arbitrary Lagrangian Eulerian ALE, Adaptive Mesh Refinement AMR, and adaptive node generation/deletion). Regardless of the type of mesh, a major difficulty is in setting up the initial mesh. Clearly a high density of grid points is essential in regions of high geometric complexity and/or regions of intense, energetic activity. For some problems, mesh generation is such a crucial part of the problem that it can take as much computational effort as the run itself, and these tasks are now taking weeks of massively parallel CPU time. Mesh generation is no less crucial to electromagnetic calculations. In fact EM problem set up can be even more challenging without the clues given by fluid motion in hydrodynamic systems. When the mesh is advected with the fluid (Lagrangian), mesh points naturally congregate in regions of high activity. Similarly in AMR algorithms, strong gradients in the fluid flow are one of the triggers for mesh refinement. In the hyperbolic Maxwell's equations without advection, mesh point placement/motion is not so intuitive. In fixed geometry systems, it at least feasible to finely mesh high leverage, geometrically challenged areas. For other systems, where the action takes place far from the boundaries and, likely, changes position in time, the options are limited to either using a high resolution (expensive) mesh in all regions that could require such resolution or adaptively generating nodes to resolve the physics as it evolves. The authors have developed a new time of adaptive node technique for Maxwell's equations to deal with this set of issues.

  6. Eigenvector centrality of nodes in multiplex networks.

    PubMed

    Solá, Luis; Romance, Miguel; Criado, Regino; Flores, Julio; García del Amo, Alejandro; Boccaletti, Stefano

    2013-09-01

    We extend the concept of eigenvector centrality to multiplex networks, and introduce several alternative parameters that quantify the importance of nodes in a multi-layered networked system, including the definition of vectorial-type centralities. In addition, we rigorously show that, under reasonable conditions, such centrality measures exist and are unique. Computer experiments and simulations demonstrate that the proposed measures provide substantially different results when applied to the same multiplex structure, and highlight the non-trivial relationships between the different measures of centrality introduced.

  7. Eigenvector centrality of nodes in multiplex networks.

    PubMed

    Solá, Luis; Romance, Miguel; Criado, Regino; Flores, Julio; García del Amo, Alejandro; Boccaletti, Stefano

    2013-09-01

    We extend the concept of eigenvector centrality to multiplex networks, and introduce several alternative parameters that quantify the importance of nodes in a multi-layered networked system, including the definition of vectorial-type centralities. In addition, we rigorously show that, under reasonable conditions, such centrality measures exist and are unique. Computer experiments and simulations demonstrate that the proposed measures provide substantially different results when applied to the same multiplex structure, and highlight the non-trivial relationships between the different measures of centrality introduced. PMID:24089967

  8. Greater auricular nerve masquerading as lymph node

    PubMed Central

    Saxena, Shilpi; Deb, Prabal; Nijhawan, Vijay Shrawan; Kharayat, Veena; Verma, Rajesh

    2015-01-01

    Hansen's disease is on the verge of being eliminated from India and often missed by clinicians due to low index of suspicion. We present an unusual case in which greater auricular nerve thickening masqueraded as enlarged lymph node in the neck. The patient was referred for fine needle aspiration cytology, which revealed epithelioid cell granulomas suggestive of Hansen's disease. Further clinical examination and investigations including the skin biopsy confirmed the disease, highlighting the role of pathologist in the management of such unusual presentation of a common disease. PMID:26229249

  9. Smart Data Node in the Sky

    NASA Technical Reports Server (NTRS)

    Lansing, Faiza; Kantak, Anil

    2007-01-01

    A document discusses the physical and engineering principles affecting the design of the Smart Data Node in the Sky (SDNITS) -- a proposed Earth-orbiting satellite for relaying scientific data from other Earth-orbiting satellites to one or more ground station(s). The document characterizes the problem of designing the telecommunication architecture of the SDNITS as consisting of two main parts: (1) finding the most advantageous orbit for the SDNITS to gather data from the scientific satellites and relay the data to the ground, taking account of such factors as visibility and range; and (2) choosing a telecommunication architecture appropriate for the intended relay function.

  10. Gamma-probe guided localization of lymph nodes.

    PubMed

    Alex, J C; Krag, D N

    1993-01-01

    The initial draining lymph node (Sentinel node) of a tumour may reflect the status of the tumours spread to the remaining lymphatic bed. The sentinel node, which has been reported to predict metastatic melanoma, has recently been localized by a new invasive technique [1]. The goal of our pre-clinical trial was to test a non-invasive technique to localize the sentinel node. Gamma-probe guided localization was used to identify and then surgically remove the first draining lymph node(s) in 16 inguinal lymphatic basins of eight cats. This method was found to be comparable to an invasive method using a blue dye. Gamma-probe localization has several potential advantages in that it can: (a) precisely locate on the surface of the skin the position of an underlying lymph node, (b) intraoperatively guide the surgeon to the lymph node during dissection, (c) verify that the correct node has been biopsied, (d) determine the possible presence of residual lymph nodes, (e) allow lymph nodes to be harvested through a small incision as opposed to raising a skin flap, and (f) be rapidly and easily performed.

  11. High-frequency Ultrasound Imaging of Mouse Cervical Lymph Nodes

    PubMed Central

    Weed, Scott A.

    2015-01-01

    High-frequency ultrasound (HFUS) is widely employed as a non-invasive method for imaging internal anatomic structures in experimental small animal systems. HFUS has the ability to detect structures as small as 30 µm, a property that has been utilized for visualizing superficial lymph nodes in rodents in brightness (B)-mode. Combining power Doppler with B-mode imaging allows for measuring circulatory blood flow within lymph nodes and other organs. While HFUS has been utilized for lymph node imaging in a number of mouse  model systems, a detailed protocol describing HFUS imaging and characterization of the cervical lymph nodes in mice has not been reported. Here, we show that HFUS can be adapted to detect and characterize cervical lymph nodes in mice. Combined B-mode and power Doppler imaging can be used to detect increases in blood flow in immunologically-enlarged cervical nodes. We also describe the use of B-mode imaging to conduct fine needle biopsies of cervical lymph nodes to retrieve lymph tissue for histological  analysis. Finally, software-aided steps are described to calculate changes in lymph node volume and to visualize changes in lymph node morphology following image reconstruction. The ability to visually monitor changes in cervical lymph node biology over time provides a simple and powerful technique for the non-invasive monitoring of cervical lymph node alterations in preclinical mouse models of oral cavity disease. PMID:26274059

  12. High-frequency Ultrasound Imaging of Mouse Cervical Lymph Nodes.

    PubMed

    Walk, Elyse L; McLaughlin, Sarah L; Weed, Scott A

    2015-01-01

    High-frequency ultrasound (HFUS) is widely employed as a non-invasive method for imaging internal anatomic structures in experimental small animal systems. HFUS has the ability to detect structures as small as 30 µm, a property that has been utilized for visualizing superficial lymph nodes in rodents in brightness (B)-mode. Combining power Doppler with B-mode imaging allows for measuring circulatory blood flow within lymph nodes and other organs. While HFUS has been utilized for lymph node imaging in a number of mouse  model systems, a detailed protocol describing HFUS imaging and characterization of the cervical lymph nodes in mice has not been reported. Here, we show that HFUS can be adapted to detect and characterize cervical lymph nodes in mice. Combined B-mode and power Doppler imaging can be used to detect increases in blood flow in immunologically-enlarged cervical nodes. We also describe the use of B-mode imaging to conduct fine needle biopsies of cervical lymph nodes to retrieve lymph tissue for histological  analysis. Finally, software-aided steps are described to calculate changes in lymph node volume and to visualize changes in lymph node morphology following image reconstruction. The ability to visually monitor changes in cervical lymph node biology over time provides a simple and powerful technique for the non-invasive monitoring of cervical lymph node alterations in preclinical mouse models of oral cavity disease. PMID:26274059

  13. Gamma-probe-guided lymph node localization in malignant melanoma.

    PubMed

    Alex, J C; Weaver, D L; Fairbank, J T; Rankin, B S; Krag, D N

    1993-10-01

    The initial draining lymph node (sentinel node) has been successfully localized using intraoperative vital dye mapping and reportedly is predictive of regional nodal metastases in Clinical- Stage 1 melanoma. In an animal model, we previously established the technique of gamma-probe-guided localization of the technetium-99 sulfur colloid labelled sentinel node and found its sensitivity equal to vital dye mapping. We now report our initial experience using gamma-probe-guided localization to identify and then surgically remove the first draining lymph node(s) in 10 malignant melanoma patients. Lymphoscintigraphy was used to confirm localization. We conclude that this technique: (a) reliably localizes the sentinel node draining the site of a primary melanoma, (b) allows the lymphatic bed to be checked intraoperatively verifying complete sentinel node biopsy, and (c) is relatively simple and can be performed under local anaesthesia.

  14. Multiplex networks with heterogeneous activities of the nodes.

    PubMed

    Cellai, Davide; Bianconi, Ginestra

    2016-03-01

    In multiplex networks with a large number of layers, the nodes can have different activities, indicating the total number of layers in which the nodes are present. Here we model multiplex networks with heterogeneous activity of the nodes and we study their robustness properties. We introduce a percolation model where nodes need to belong to the giant component only on the layers where they are active (i.e., their degree on that layer is larger than zero). We show that when there are enough nodes active only in one layer, the multiplex becomes more resilient and the transition becomes continuous. We find that multiplex networks with a power-law distribution of node activities are more fragile if the distribution of activity is broader. We also show that while positive correlations between node activity and degree can enhance the robustness of the system, the phase transition may become discontinuous, making the system highly unpredictable. PMID:27078361

  15. Sub-10 nm carbon nanotube transistor.

    PubMed

    Franklin, Aaron D; Luisier, Mathieu; Han, Shu-Jen; Tulevski, George; Breslin, Chris M; Gignac, Lynne; Lundstrom, Mark S; Haensch, Wilfried

    2012-02-01

    Although carbon nanotube (CNT) transistors have been promoted for years as a replacement for silicon technology, there is limited theoretical work and no experimental reports on how nanotubes will perform at sub-10 nm channel lengths. In this manuscript, we demonstrate the first sub-10 nm CNT transistor, which is shown to outperform the best competing silicon devices with more than four times the diameter-normalized current density (2.41 mA/μm) at a low operating voltage of 0.5 V. The nanotube transistor exhibits an impressively small inverse subthreshold slope of 94 mV/decade-nearly half of the value expected from a previous theoretical study. Numerical simulations show the critical role of the metal-CNT contacts in determining the performance of sub-10 nm channel length transistors, signifying the need for more accurate theoretical modeling of transport between the metal and nanotube. The superior low-voltage performance of the sub-10 nm CNT transistor proves the viability of nanotubes for consideration in future aggressively scaled transistor technologies.

  16. Radiation Tolerance of 65nm CMOS Transistors

    DOE PAGES

    Krohn, M.; Bentele, B.; Christian, D. C.; Cumalat, J. P.; Deptuch, G.; Fahim, F.; Hoff, J.; Shenai, A.; Wagner, S. R.

    2015-12-11

    We report on the effects of ionizing radiation on 65 nm CMOS transistors held at approximately -20°C during irradiation. The pattern of damage observed after a total dose of 1 Grad is similar to damage reported in room temperature exposures, but we observe less damage than was observed at room temperature.

  17. White Sands, Carrizozo Lava Beds, NM

    NASA Technical Reports Server (NTRS)

    1973-01-01

    A truly remarkable view of White Sands and the nearby Carrizozo Lava Beds in southeast NM (33.5N, 106.5W). White Sands, site of the WW II atomic bomb development and testing facility and later post war nuclear weapons testing that can still be seen in the cleared circular patterns on the ground.

  18. Negative-tone 193-nm resists

    NASA Astrophysics Data System (ADS)

    Cho, Sungseo; Vander Heyden, Anthony; Byers, Jeff D.; Willson, C. Grant

    2000-06-01

    A great deal of progress has been made in the design of single layer positive tone resists for 193 nm lithography. Commercial samples of such materials are now available from many vendors. The patterning of certain levels of devices profits from the use of negative tone resists. There have been several reports of work directed toward the design of negative tones resists for 193 nm exposure but, none have performed as well as the positive tone systems. Polymers with alicyclic structures in the backbone have emerged as excellent platforms from which to design positive tone resists for 193 nm exposure. We now report the adaptation of this class of polymers to the design of high performance negative tone 193 nm resists. New systems have been prepared that are based on a polarity switch mechanism for modulation of the dissolution rate. The systems are based on a polar, alicyclic polymer backbone that includes a monomer bearing a glycol pendant group that undergoes the acid catalyzed pinacol rearrangement upon exposure and bake to produce the corresponding less polar ketone. This monomer was copolymerized with maleic anhydride and a norbornene bearing a bis-trifluoromethylcarbinol. The rearrangement of the copolymer was monitored by FT-IR as a function of temperature. The synthesis of the norbornene monomers will be presented together with characterization of copolymers of these monomers with maleic anhydride. The lithographic performance of the new resist system will also be presented.

  19. MEPHISTO spectromicroscope reaches 20 nm lateral resolution

    NASA Astrophysics Data System (ADS)

    De Stasio, Gelsomina; Perfetti, Luca; Gilbert, B.; Fauchoux, O.; Capozi, M.; Perfetti, P.; Margaritondo, G.; Tonner, B. P.

    1999-03-01

    The recently described tests of the synchrotron imaging photoelectron spectromicroscope MEPHISTO (Microscope à Emission de PHotoélectrons par Illumination Synchrotronique de Type Onduleur) were complemented by further resolution improvements and tests, which brought the lateral resolution down to 20 nm. Images and line plot profiles demonstrate such performance.

  20. 1541nm GmAPD LADAR system

    NASA Astrophysics Data System (ADS)

    Kutteruf, Mary R.; Lebow, Paul

    2014-06-01

    The single photon sensitivity of Geiger-mode avalanche photo diodes (GmAPDs) has facilitated the development of LADAR systems that operate at longer stand-off distances, require lower laser pulse powers and are capable of imaging through a partial obscuration. In this paper, we describe a GmAPD LADAR system which operates at the eye-safe wavelength of 1541 nm. The longer wavelength should enhance system covertness and improve haze penetration compared to systems using 1064 nm lasers. The system is comprised of a COTS 1541 nm erbium fiber laser producing 4 ns pulses at 80 kHz to 450 kHz and a COTS camera with a focal plane of 32x32 InGaAs GmAPDs band-gap optimized for 1550 nm. Laboratory characterization methodology and results are discussed. We show that accurate modeling of the system response, allows us to achieve a depth resolution which is limited by the width of the camera's time bin (.25 ns or 1.5 inches) rather than by the duration of the laser pulse (4 ns or 2 ft.). In the presence of obscuration, the depth discrimination is degraded to 6 inches but is still significantly better than that dictated by the laser pulse duration. We conclude with a discussion of future work.

  1. Synthesis, Average Structure, and Magnetic Properties of Oxygen Deficient Perovskites (Ba 2-3 xBi 3 x-1 )(Fe 2 xBi 1-2 x)O 2+3/2 x

    NASA Astrophysics Data System (ADS)

    Boullay, Ph.; Hervieu, M.; Nguyen, N.; Raveau, B.

    1999-10-01

    A new family of oxygen deficient perovskite [Ba2-3xBi3x-1] [Fe2xBi1-2x]O2+3x/2 has been synthesized for 1/3≤x≤1/2. The average structure of these phases is determined using a combination of X-ray, neutron powder diffraction, and electron diffraction. The compounds exhibit a cubic subcell (a=ap) for x≤0.43 and a tetragonal subcell (a≈c≈ap) for 0.43

  2. Optical characterization of ex-vivo axillary lymph nodes of breast-cancer patients using a custom-built spectrophotometer

    NASA Astrophysics Data System (ADS)

    Sampathkumar, Ashwin; Saegusa-Beecroft, Emi; Mamou, Jonathan; Chitnis, Parag V.; Machi, Junji; Feleppa, Ernest J.

    2014-03-01

    Quantitative photoacoustics is emerging as a new hybrid modality to investigate diseases and cells in human pathology and cytology studies. Optical absorption of light is the predominant mechanism behind the photoacoustic effect. Therefore, a need exits to characterize the optical properties of specimens and to identify the relevant operating wavelengths for photoacoustic imaging. We have developed a custom low-cost spectrophotometer to measure the optical properties of human axillary lymph nodes dissected for breast-cancer staging. Optical extinction curves of positive and negative nodes were determined in the spectral range of 400 to 1000 nm. We have developed a model to estimate tissue optical properties, taking into account the role of fat and saline. Our results enabled us to select the optimal optical wavelengths for maximizing the imaging contrast between metastatic and noncancerous tissue in axillary lymph nodes.

  3. Process feasibility investigation of freezing free litho-litho-etch process for below 32nm hp

    NASA Astrophysics Data System (ADS)

    Nakamura, Tsuyoshi; Takeshita, Masaru; Yokoya, Jiro; Yoshii, Yasuhiro; Saito, Hirokuni; Takasu, Ryoichi; Ohmori, Katsumi

    2010-04-01

    Double patterning with 193nm immersion lithography becomes to most promising candidate for 32nm half pitch node and possibly below 32nm half pitch. Several double patterning methods have been suggested such as LELE (Litho-Etch -Litho-Etch), LLE (Litho-Litho-Etch) and Spacer defined process, however, LLE process is pointed out as low cost double patterning technique because of its simplicity. But LLE process needs new method to maintain 1st lithography pattern and additional freezing processes have been suggested In SPIE Advanced Lithography 2009, freezing free "Posi/Posi" process was introduced as candidate for LLE process. This is LLE process that uses two different positive tone photoresists without freezing process. The resist for 2nd lithography contains a specific solvent to prevent the mixing of two resists and there is an activation energy gap between 1st and 2nd resists to maintain 1st lithography pattern. The double patterning can be successfully processed by these specific resists without freezing process. In this study, the performance of this freezing free "Posi/Posi" process is investigated for pitch splitting pattern using 1.35 NA exposure tool. The imaging results including CD control capability, and etching results are collected for 32nm half pitch and below. Additionally the two-dimensional pattern imaging is also obtained for 76nm minimum pitch.

  4. Optimization of pulse sequences in magnetic resonance lymphography of axillary lymph nodes using magnetic nanoparticles.

    PubMed

    Gharehaghaji, Nahideh; Oghabian, Mohammad Ali; Sarkar, Saeed; Amirmohseni, Saeedeh; Ghanaati, Hossein

    2009-07-01

    Magnetic resonance imaging pulse sequences have an important role in detection of lymph nodes using magnetic nanoparticles as a contrast agent. Current imaging sequences lack an optimum pulse sequence based on lymph node relaxation times after accumulation of magnetic nanoparticles. This deficiency is due to the limited information regarding the particle uptake in tissues, and their related magnetic properties used by magnetic resonance imaging. The aim of this study is to optimize the imaging pulse sequences based on in vivo measurement of relaxation times for obtaining the best contrast-enhanced images of axillary lymph nodes. In vivo studies were performed on normal rats on a 1.5 T clinical magnetic resonance imaging system. The used contrast agent was dextran coated iron oxide nanoparticles with a mean diameter of 20 nm. Relaxation time measurements were performed for enhanced (after injection) and nonenhanced axillary lymph nodes, and the surrounding tissue. Since magnetic resonance signal depends highly on tissue parameters; T1, T2, and T2*, as well as magnetic resonance acquisition parameters; repetition time and echo time, knowing the tissue characteristics is important in order to design a right magnetic resonance protocol for each application. Based on our proposed approach, the relaxivity characteristic of the lymph node after accumulation of a contrast agent and its corresponding relaxation rate is used to define optimum imaging parameters (i.e., repetition time and echo time) for maximum contrast. According to these imaging parameter values, various T1, T2, T2* and proton density weighted sequences were applied. Optimum pulse sequences were found to be T2*-weighted fast gradient echo, T1-weighted fast spoiled gradient echo and proton density-weighted fast spin echo sequences.

  5. Comparison of GT3X accelerometer and Yamax pedometer steps/day in a free-living sample of overweight and obese adults

    Technology Transfer Automated Retrieval System (TEKTRAN)

    The purpose of this study was to compare steps/day detected by the YAMAX SW-200 pedometer versus the Actigraph GT3X accelerometer in free-living adults. Daily YAMAX and GT3X steps were collected from a sample of 23 overweight and obese participants (78% female; age = 52.6 +/- 8.4 yr.; BMI = 31.0 +/-...

  6. Prognostic Significance of Number of Positive Nodes: A Long-Term Study of One to Two Nodes Versus Three Nodes in Breast Cancer Patients

    SciTech Connect

    Tai, Patricia; Yu, Edward; Joseph, Kurian

    2010-05-01

    Purpose: Previous reports of breast cancer have generally analyzed patients with one to three positive lymph nodes as a single group, often leading to controversy regarding the practical clinical applicability. The present study separately analyzed the survival outcomes of Stage T1-T2 breast cancer patients according to whether one, two, or three axillary nodes were pathologically positive. Methods and Materials: The records of 5,996 patients were available for analysis from the population-based Saskatchewan provincial registry between 1981 and 1995. Because the reliability of the nodal assessment depends on the number of lymph nodes sampled, only those 755 patients with Stage T1-T2 disease and eight or more nodes examined were analyzed further for overall survival and cause-specific survival (CSS). Results: Patients with one and two positive nodes had nearly indistinguishable survival plots, but those with three positive nodes had a distinct trend toward worse survival. The overall survival rate of patients with one, two, and three nodes at 5, 10, and 15 years was 82.7%, 77.0%, and 79.0%, 64.8%, 60.9%, and 52.8%, and 48.8%, 48.0%, and 40.9%, respectively (p = .11). The corresponding CSS rates at 5, 10, and 15 years were 89.4%, 82.0%, and 81.3%, 78.87%, 72.9%, and 62.1%, and 72.7%. 69.0%, and 55.6% (p = .0004). The use of regional radiotherapy did not confer any apparent survival benefit in terms of either overall survival or CSS. Conclusion: Patients with one or two positive nodes had a similar CSS. However, those with three positive nodes fared worse, with a significantly reduced CSS compared with those with one or two involved nodes. Thus, the survival data among patients with one to three nodes positive reveals clearly relevant differences when analyzed separately.

  7. Social temperament and lymph node innervation

    PubMed Central

    Sloan, Erica K.; Capitanio, John P.; Tarara, Ross P.; Cole, Steve W.

    2008-01-01

    Socially inhibited individuals show increased vulnerability to viral infections, and this has been linked to increased activity of the sympathetic nervous system (SNS). To determine whether structural alterations in SNS innervation of lymphoid tissue might contribute to these effects, we assayed the density of catecholaminergic nerve fibers in 13 lymph nodes from 7 healthy adult rhesus macaques that showed stable individual differences in propensity to socially affiliate (Sociability). Tissues from Low Sociable animals showed a 2.8-fold greater density of catecholaminergic innervation relative to tissues from High Sociable animals, and this was associated with a 2.3-fold greater expression of nerve growth factor (NGF) mRNA, suggesting a molecular mechanism for observed differences. Low Sociable animals also showed alterations in lymph node expression of the immunoregulatory cytokine genes IFNG and IL4, and lower secondary IgG responses to tetanus vaccination. These findings are consistent with the hypothesis that structural differences in lymphoid tissue innervation might potentially contribute to relationships between social temperament and immunobiology. PMID:18068331

  8. VizieR Online Data Catalog: Thorium spectrum from 250nm to 5500nm (Redman+, 2014)

    NASA Astrophysics Data System (ADS)

    Redman, S. L.; Nave, G.; Sansonetti, C. J.

    2014-04-01

    We observed the spectrum of a commercial sealed Th/Ar HCL running at 25mA for almost 15hr starting on 2011 November 2. The region of observation was limited to between 8500/cm and 28000/cm (360nm and 1200nm) by the sensitivity of the silicon photodiode detector. (5 data files).

  9. 120 nm resolution and 55 nm structure size in STED-lithography.

    PubMed

    Wollhofen, Richard; Katzmann, Julia; Hrelescu, Calin; Jacak, Jaroslaw; Klar, Thomas A

    2013-05-01

    Two-photon direct laser writing (DLW) lithography is limited in the achievable structure size as well as in structure resolution. Adding stimulated emission depletion (STED) to DLW allowed overcoming both restrictions. We now push both to new limits. Using visible light for two-photon DLW (780 nm) and STED (532 nm), we obtain lateral structure sizes of 55 nm, a Sparrow limit of around 100 nm and we present two clearly separated lines spaced only 120 nm apart. The photo-resist used in these experiments is a mixture of tri- and tetra-acrylates and 7-Diethylamino-3-thenoylcoumarin as a photo-starter which can be readily quenched via STED.

  10. Enhanced performance of CH3NH3PbI3- x Cl x perovskite solar cells by CH3NH3I modification of TiO2-perovskite layer interface

    NASA Astrophysics Data System (ADS)

    Wang, Wen; Zhang, Zongbao; Cai, Yangyang; Chen, Jinshan; Wang, Jianming; Huang, Riyan; Lu, Xubing; Gao, Xingsen; Shui, Lingling; Wu, Sujuan; Liu, Jun-Ming

    2016-06-01

    In this work, perovskite solar cells (PSCs) with CH3NH3PbI3- x Cl x as active layer and spiro-OMeTAD as hole-transport media have been fabricated by one-step method. The methylammonium iodide (CH3NH3I) solution with different concentrations is used to modify the interface between mesoporous TiO2 (meso-TiO2) film and CH3NH3PbI3- x Cl x perovskite layer. Several techniques including X-ray diffraction, scanning electron microscopy, optical absorption, electrochemical impedance spectroscopy (EIS) and photoluminescence are used to investigate the effect of the interfacial modification. It is found that the interfacial modification by CH3NH3I enhance the crystallinity and increase the grain size of CH3NH3PbI3- x Cl x layer, and improve the surface wetting properties of perovskite precursor on meso-TiO2 film. The sunlight absorption and external quantum efficiency of PSCs in the visible region with wavelength less than 600 nm have been improved. The Nyquist plots obtained from the EIS suggest that the CH3NH3I modification can reduce the charge recombination rates. The photoluminescence measurement shows that the exciton dissociation in the modified devices is more effective than that in the control samples. The photovoltaic performance of the modified devices can be significantly improved with respect to the reference (control) devices. The CH3NH3I modified devices at the optimized concentration demonstrate the average power conversion efficiency of 12.27 % in comparison with the average efficiency of 9.68 % for the reference devices.

  11. Enhanced performance of CH3NH3PbI3-x Cl x perovskite solar cells by CH3NH3I modification of TiO2-perovskite layer interface.

    PubMed

    Wang, Wen; Zhang, Zongbao; Cai, Yangyang; Chen, Jinshan; Wang, Jianming; Huang, Riyan; Lu, Xubing; Gao, Xingsen; Shui, Lingling; Wu, Sujuan; Liu, Jun-Ming

    2016-12-01

    In this work, perovskite solar cells (PSCs) with CH3NH3PbI3-x Cl x as active layer and spiro-OMeTAD as hole-transport media have been fabricated by one-step method. The methylammonium iodide (CH3NH3I) solution with different concentrations is used to modify the interface between mesoporous TiO2 (meso-TiO2) film and CH3NH3PbI3-x Cl x perovskite layer. Several techniques including X-ray diffraction, scanning electron microscopy, optical absorption, electrochemical impedance spectroscopy (EIS) and photoluminescence are used to investigate the effect of the interfacial modification. It is found that the interfacial modification by CH3NH3I enhance the crystallinity and increase the grain size of CH3NH3PbI3-x Cl x layer, and improve the surface wetting properties of perovskite precursor on meso-TiO2 film. The sunlight absorption and external quantum efficiency of PSCs in the visible region with wavelength less than 600 nm have been improved. The Nyquist plots obtained from the EIS suggest that the CH3NH3I modification can reduce the charge recombination rates. The photoluminescence measurement shows that the exciton dissociation in the modified devices is more effective than that in the control samples. The photovoltaic performance of the modified devices can be significantly improved with respect to the reference (control) devices. The CH3NH3I modified devices at the optimized concentration demonstrate the average power conversion efficiency of 12.27 % in comparison with the average efficiency of 9.68 % for the reference devices.

  12. EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

    NASA Astrophysics Data System (ADS)

    Takekoshi, Hidekazu; Nakayama, Takahito; Saito, Kenichi; Ando, Hiroyoshi; Inoue, Hideo; Nakayamada, Noriaki; Kamikubo, Takashi; Nishimura, Rieko; Kojima, Yoshinori; Yashima, Jun; Anpo, Akihito; Nakazawa, Seiichi; Iijima, Tomohiro; Ohtoshi, Kenji; Anze, Hirohito; Katsap, Victor; Golladay, Steven; Kendall, Rodney

    2014-07-01

    EBM-9000 equipped with new features such as new electron optics, high current density (800A/cm2) and high speed deflection control has been developed for the 11nm technology node(tn) (half pitch (hp) 16nm). Also in parallel of aggressive introduction of new technologies, EBM-9000 inherits the 50kV variable shaped electron beam / vector scan architecture, continuous stage motion and VSB-12 data format handling from the preceding EBM series to maintain high reliability accepted by many customers. This paper will report our technical challenges and results obtained through the development.

  13. Photoresist outgassing at 157 nm exposure

    NASA Astrophysics Data System (ADS)

    Hien, Stefan; Angood, Steve; Ashworth, Dominic; Basset, Steve; Bloomstein, Theodore M.; Dean, Kim R.; Kunz, Roderick R.; Miller, Daniel A.; Patel, Shashikant; Rich, Georgia K.

    2001-08-01

    Contamination of optical elements during photoresist exposure is a serious issue in optical lithography. The outgassing of photoresist has been identified as a problem at 248nm and 193nm in production because the organic films that can be formed on an exposure lens can cause transmission loss and sever image distortion. At these exposure energies, the excitation of the photo acid generator, formation of acid, and cleavage of the protecting group are highly selective processes. At 157nm, the exposure energy is much higher (7.9 eV compared to 6.4 eV at 193nm) and it is known from laser ablation experiments that direct laser cleavage of sigma bonds occurs. The fragments formed during this irradiation can be considered as effective laser deposition precursors even in the mid ppb level. In this study, methods to quantify photoresist outgassing at 157 nm are discussed. Three criteria have been set up at International SEMATECH to protect lens contamination and to determine the severity of photoresist outgassing. First, we measured film thickness loss as a function of exposure dose for a variety of materials. In a second test we studied the molecular composition of the outgassing fragments with an exposure chamber coupled to a gas chromatograph and a mass spectrometer detector. Our third method was a deposition test of outgassing vapors on a CaF2 proof plate followed by analysis using VUV and X-ray photoelectron spectroscopies (XPS). With this technique we found deposits for many different resists. Our main focus is on F- and Si- containing resists. Both material classes form deposits especially if these atoms are bound to the polymer side chains. Whereas the F-containing films can be cleaned off under 157nm irradiation, cleaning of Si-containing films mainly produces SiO2. Our cleaning studies of plasma deposited F-containing organic films on SiO2 did not indicate damage of this surface by the possible formation of HF. Despite that we strongly recommend engineering

  14. Sentinel node identification by scintigraphic methods in cutaneous melanoma.

    PubMed

    Dias Moreira, R; Altino de Almeida, S; Maliska Guimarães, C M; Resende, J F; Gutfilen, B; Barbosa da Fonseca, L M

    2005-06-01

    In melanoma patients lymph node metastasis is an important prognostic factor that indicates the need for therapeutic lymph node dissection. Preoperative lymphoscintigraphy mapping associated with radioguided sentinel lymph node biopsy has become a well established procedure for cutaneous melanoma patients without clinically detectable lymph node metastases (stage I, II). This technique is a versatile way of characterizing the lymphatic basin at risk for metastases and identifying involved lymph nodes. The purpose of the present study was to examine the reproducibility of lymphoscintigraphy and sentinel lymph node biopsy in detecting micro metastases in cutaneous melanoma. The study was a single-institution prospective analysis of 74 melanoma patients, with primary tumors having Breslow thickness > 0.7 mm, who underwent lymphoscintigraphies between May 2002 and September 2003. Technetium-99m sulfur colloid was injected intradermally at the primary tumor site and dynamic images were obtained for 40 minutes. Two observers evaluated the images. One to two weeks after the first lymphoscintigraphy, radioguided lymph node biopsy was performed. For the biopsy, technetium-99m sulfer colloid was injected intradermally in the same manner as performed before. Lymph nodes were identified and removed with the aid of a gamma ray detecting probe (GDP), and were submitted to histopathological analysis. The histopathological analysis of the sentinel lymph nodes collected during surgery was performed in a sequential manner. First, frozen sections were analyzed during surgery. The lymph nodes considered negative by frozen section were analyzed by H&E staining. Subsequently, the slides considered negative with H&E were sent for immunohistochemical analysis. Lymphoscintigraphy identified at least one sentinel lymph node in all patients. Sentinel node biopsy detected metastases in 20 patients (27.2%). In all cases the lymph node basins identified during lymphoscintigraphy were found to

  15. Improved thermoelectric properties of Bi2Te3-xSex alloys by melt spinning and resistance pressing sintering

    NASA Astrophysics Data System (ADS)

    Cai, Xinzhi; Fan, Xi'an; Rong, Zhenzhou; Yang, Fan; Gan, Zhanghua; Li, Guangqiang

    2014-03-01

    Starting from bismuth, tellurium and selenium chunks, n-type Bi2Te3-xSex (x ⩽ 0.3) alloys were obtained by melt spinning (MS) combined with a resistance pressing sintering (RPS) process. The phases, microstructures and compositions of the samples were evaluated by x-ray diffraction, field emission scanning electron microscopy, and energy dispersive x-ray spectroscopy during each step in the preparation process, respectively. The influences of Se doping, MS and RPS processes on the thermoelectric (TE) properties of Bi2Te3-xSex alloys were investigated in detail. The Bi2Te3-xSex powders could be well compacted by the RPS process and the relative densities of the bulks prepared by RPS were all higher than 96%. The partially oriented lamellar structure could be observed at some regions of the samples prepared by RPS, and the monolayer thickness of the lamellar structure in the MS-RPS samples was smaller than that in the smelting-RPS sample. The MS process was confirmed as an excellent method to obtain fine microstructures and low lattice thermal conductivity for the TE materials. All evidence about electrical and thermal transport properties suggested that suitably increasing the Se content could effectively improve the ZT value. The maximum ZT value of 0.84 was obtained for the Bi2Te2.7Se0.3 prepared by MS-RPS at 423 K. As opposed to the conventional hot pressing and spark plasma sintering, the RPS method introduced here is more suitable for practical industrial application due to its cost saving and high efficiency.

  16. 17O NMR study of the doped electrons in lightly oxygen-deficient cubic SrMnO3 -x

    NASA Astrophysics Data System (ADS)

    Trokiner, A.; Verkhovskii, S.; Volkova, Z.; Gerashenko, A.; Mikhalev, K.; Germov, A.; Yakubovskii, A.; Korolev, A.; Dabrowski, B.; Tyutyunnik, A.

    2016-05-01

    The spin susceptibility of the localized Mn (t2 g) electrons, χs, and the spatially distributed spin density of the doped electrons were investigated by 17O nuclear magnetic resonance (NMR) in the paramagnetic (PM) and antiferromagnetic (AF) phases of electron-doped SrMnO3 -x ceramics with the cubic structure. Three lightly doped samples (2 x <0.015 ) were studied with TN=220 K-240 K. In the PM state χs increases gradually from TN and reaches a broad maximum above ˜1.5 TN . The gapped behavior of χs indicates a low-dimensional short-range spin order persisting above TN. These short-range one-dimensional correlations are consistent with 17O NMR results obtained at room temperature, which show that Mn magnetic moments are aligned along the edges of the cubic unit cell. Above 350 K all doped electrons are fast-moving eg electrons. They provide the uniform polarization of the localized spins which increases χs and the increasing doping shifts the oxygen-deficient SrMnO3 -x oxide towards a ferromagnetic (FM) metallic state. At lower T the doped electrons are heterogeneously distributed in the oxide: The fraction of the fast-moving electrons diminishes and vanishes below 100 K, while the remaining doped electrons slow down their hopping and each of them creates a FM domain. These FM domains which are detected below 10 K by 55Mn NMR can be considered as small-size magnetic polarons. Their T -activated hopping in the G-type AF lattice was probed by 17O spin-echo experiments. The energy barrier of hopping shows a trend to grow with increasing doping, indicating that the de Gennes metallic ground state cannot be achieved in oxygen-deficient SrMnO3 -x oxides, probably due to detrimental oxygen vacancy defects.

  17. PAK Inactivation Impairs Social Recognition in 3xTg-AD Mice without Increasing Brain Deposition of Tau and Aβ

    PubMed Central

    Arsenault, Dany; Dal-Pan, Alexandre; Tremblay, Cyntia; Bennett, David A.; Guitton, Matthieu J.; De Koninck, Yves; Tonegawa, Susumu

    2013-01-01

    Defects in p21-activated kinase (PAK) are suspected to play a role in cognitive symptoms of Alzheimer's disease (AD). Dysfunction in PAK leads to cofilin activation, drebrin displacement from its actin-binding site, actin depolymerization/severing, and, ultimately, defects in spine dynamics and cognitive impairment in mice. To determine the role of PAK in AD, we first quantified PAK by immunoblotting in homogenates from the parietal neocortex of subjects with a clinical diagnosis of no cognitive impairment (n = 12), mild cognitive impairment (n = 12), or AD (n = 12). A loss of total PAK, detected in the cortex of AD patients (−39% versus controls), was correlated with cognitive impairment (r2 = 0.148, p = 0.027) and deposition of total and phosphorylated tau (r2 = 0.235 and r2 = 0.206, respectively), but not with Aβ42 (r2 = 0.056). Accordingly, we found a decrease of total PAK in the cortex of 12- and 20-month-old 3xTg-AD mice, an animal model of AD-like Aβ and tau neuropathologies. To determine whether PAK dysfunction aggravates AD phenotype, 3xTg-AD mice were crossed with dominant-negative PAK mice. PAK inactivation led to obliteration of social recognition in old 3xTg-AD mice, which was associated with a decrease in cortical drebrin (−25%), but without enhancement of Aβ/tau pathology or any clear electrophysiological signature. Overall, our data suggest that PAK decrease is a consequence of AD neuropathology and that therapeutic activation of PAK may exert symptomatic benefits on high brain function. PMID:23804095

  18. Structural, electronic, and magnetic properties of tetragonal Mn{sub 3-x}Ga: Experiments and first-principles calculations

    SciTech Connect

    Winterlik, Juergen; Balke, Benjamin; Fecher, Gerhard H.; Felser, Claudia; Alves, Maria C. M.; Bernardi, Fabiano; Morais, Jonder

    2008-02-01

    This work reports on the electronic, magnetic, and structural properties of the binary intermetallic compounds Mn{sub 3-x}Ga. The tetragonal DO{sub 22} phase of the Mn{sub 3-x}Ga series, with x varying from 0 to 1.0 in steps of x=0.1, was successfully synthesized and investigated. It was found that all these materials are hard magnetic, with energy products ranging from 10.1 kJ m{sup -3} for low Mn content (x{yields}1) to 61.6 kJ m{sup -3} for high Mn content (x{yields}0). With decreasing Mn content, the average saturation magnetization per atom increases from 0.26{mu}{sub B} for Mn{sub 3}Ga to 0.47{mu}{sub B} for Mn{sub 2}Ga. The increase in the saturation magnetization as the Mn content is reduced indicates a ferrimagnetic order with partially compensating moments of the two different Mn atoms on the two crystallographically different sites of the DO{sub 22} structure. This type of magnetic order is supported by ab initio calculations of the electronic structure that predict a nearly half-metallic ferrimagnet with the highest spin polarization of 88% at the Fermi energy for Mn{sub 3}Ga. The Curie temperature of the compounds is restricted to approximately 770 K because of a structural phase transition to the hexagonal DO{sub 19} phase. Thermal irreversibilities between zero-field-cooled and field-cooled measurements suggest that the Mn{sub 3-x}Ga series belongs to the class of magnetically frustrated ferrimagnets. The most pronounced magnetic anomaly is found for Mn{sub 3}Ga.

  19. Novel method and applications for labeling and identifying lymph nodes

    NASA Astrophysics Data System (ADS)

    Kiraly, Atilla P.; Naidich, David P.; Guendel, Lutz; Zhang, Li; Novak, Carol L.

    2007-03-01

    The lymphatic system comprises a series of interconnected lymph nodes that are commonly distributed along branching or linearly oriented anatomic structures. Physicians must evaluate lymph nodes when staging cancer and planning optimal paths for nodal biopsy. This process requires accurately determining the lymph node's position with respect to major anatomical landmarks. In an effort to standardize lung cancer staging, The American Joint Committee on Cancer (AJCC) has classified lymph nodes within the chest into 4 groups and 14 sub groups. We present a method for automatically labeling lymph nodes according to this classification scheme, in order to improve the speed and accuracy of staging and biopsy planning. Lymph nodes within the chest are clustered around the major blood vessels and the airways. Our fully automatic labeling method determines the nodal group and sub-group in chest CT data by use of computed airway and aorta centerlines to produce features relative to a given node location. A classifier then determines the label based upon these features. We evaluate the efficacy of the method on 10 chest CT datasets containing 86 labeled lymph nodes. The results are promising with 100% of the nodes assigned to the correct group and 76% to the correct sub-group. We anticipate that additional features and training data will further improve the results. In addition to labeling, other applications include automated lymph node localization and visualization. Although we focus on chest CT data, the method can be generalized to other regions of the body as well as to different imaging modalities.

  20. Fractal dimension analysis of malignant and benign endobronchial ultrasound nodes

    PubMed Central

    2014-01-01

    Background Endobronchial ultrasonography (EBUS) has been applied as a routine procedure for the diagnostic of hiliar and mediastinal nodes. The authors assessed the relationship between the echographic appearance of mediastinal nodes, based on endobronchial ultrasound images, and the likelihood of malignancy. Methods The images of twelve malignant and eleven benign nodes were evaluated. A previous processing method was applied to improve the quality of the images and to enhance the details. Texture and morphology parameters analyzed were: the image texture of the echographies and a fractal dimension that expressed the relationship between area and perimeter of the structures that appear in the image, and characterizes the convoluted inner structure of the hiliar and mediastinal nodes. Results Processed images showed that relationship between log perimeter and log area of hilar nodes was lineal (i.e. perimeter vs. area follow a power law). Fractal dimension was lower in the malignant nodes compared with non-malignant nodes (1.47(0.09), 1.53(0.10) mean(SD), Mann–Whitney U test p < 0.05)). Conclusion Fractal dimension of ultrasonographic images of mediastinal nodes obtained through endobronchial ultrasound differ in malignant nodes from non-malignant. This parameter could differentiate malignat and non-malignat mediastinic and hiliar nodes. PMID:24920158

  1. Lymph node ratio may predict the benefit of postoperative radiotherapy in node-positive cervical cancer

    PubMed Central

    He, Zhen-Yu; Sun, Jia-Yuan; Li, Feng-Yan; Lin, Huan-Xin; You, Ke-Li

    2016-01-01

    The standard treatment for node-positive cervical cancer after radical hysterectomy is pelvic radiotherapy and concurrent chemotherapy. Given the potential toxicity of postoperative radiotherapy, we used the lymph node ratio (LNR) to assess the benefit of postoperative radiotherapy in lymph node-positive cervical cancer patients. Data from the Surveillance Epidemiology and End Results database (1988–2010) were analyzed using Kaplan–Meier and Cox regression proportional hazard analysis. A total of 2,269 eligible patients were identified (median follow-up, 78.0 months); 1,863 (82.1%) patients received postoperative radiotherapy. In both univariate and multivariate analysis multivariate analysis, a higher LNR was significantly associated with a poorer outcome. A LNR > 0.16 was associated with poorer cervical cancer-related survival (CCSS) (hazard Ratio [HR] 1.376, confidence interval [CI] 1.082–1.750; P < 0.001) and overall survival (OS) (HR 1.287, CI 1.056–1.569; P = 0.012). Postoperative radiotherapy was only associated with survival benefits in patients with a LNR > 0.16 (CCSS, P < 0.001; OS, P < 0.001) and not in patients with a LNR ≤ 0.16 (CCSS, P = 0.620; OS, P = 0.167); these trends were not affected by number of removed lymph nodes. A higher LNR is associated with a poorer survival in lymph node-positive cervical cancer. The survival benefits of postoperative radiotherapy appear to be limited to patients with a LNR > 0.16. PMID:27105541

  2. Lymph node ratio may predict the benefit of postoperative radiotherapy in node-positive cervical cancer.

    PubMed

    Zhou, Juan; Chen, Qiong-Hua; Wu, San-Gang; He, Zhen-Yu; Sun, Jia-Yuan; Li, Feng-Yan; Lin, Huan-Xin; You, Ke-Li

    2016-05-17

    The standard treatment for node-positive cervical cancer after radical hysterectomy is pelvic radiotherapy and concurrent chemotherapy. Given the potential toxicity of postoperative radiotherapy, we used the lymph node ratio (LNR) to assess the benefit of postoperative radiotherapy in lymph node-positive cervical cancer patients. Data from the Surveillance Epidemiology and End Results database (1988-2010) were analyzed using Kaplan-Meier and Cox regression proportional hazard analysis. A total of 2,269 eligible patients were identified (median follow-up, 78.0 months); 1,863 (82.1%) patients received postoperative radiotherapy. In both univariate and multivariate analysis multivariate analysis, a higher LNR was significantly associated with a poorer outcome. A LNR > 0.16 was associated with poorer cervical cancer-related survival (CCSS) (hazard Ratio [HR] 1.376, confidence interval [CI] 1.082-1.750; P < 0.001) and overall survival (OS) (HR 1.287, CI 1.056-1.569; P = 0.012). Postoperative radiotherapy was only associated with survival benefits in patients with a LNR > 0.16 (CCSS, P < 0.001; OS, P < 0.001) and not in patients with a LNR ≤ 0.16 (CCSS, P = 0.620; OS, P = 0.167); these trends were not affected by number of removed lymph nodes. A higher LNR is associated with a poorer survival in lymph node-positive cervical cancer. The survival benefits of postoperative radiotherapy appear to be limited to patients with a LNR > 0.16. PMID:27105541

  3. An ab initio study on the formation of interstellar tricarbon isomers l-C 3(X 1Σg+) and c-C 3(X 3A 2')

    NASA Astrophysics Data System (ADS)

    Mebel, A. M.; Kaiser, R. I.

    2002-07-01

    Ab initio CCSD(T)/6-311+G(3df,2p)//B3LYP/6-311G(d,p) calculations have been performed to investigate potential energy surfaces of the C( 3Pj)+ C2H( X2Σ +) and CH( X2Π Ω)+ C2( X1Σ g+) reactions. Both reactions are shown to proceed by barrierless additions of C( 3Pj) and CH to C 2H and C 2, respectively, to produce the c-C 3H(X 2B 1) and l- C3H( X2Π Ω) intermediates with high exothermicities, which can rearrange to each other via a barrier of 27 kcal/mol. l-C 3H fragments into l- C3( X1Σ g+)+ H( 2S1/2) (the major product), and c-C 3H dissociates to c- C3( X3A2')+ H( 2S1/2) (the minor product), both without an exit barrier. The reactions represent facile neutral-neutral pathways to produce tricarbon isomers in interstellar environments.

  4. DFT Study of the Role of Al3+ in the Fast Ion-Conductor Li7–3xAl3+xLa3Zr2O12 Garnet

    PubMed Central

    2014-01-01

    We investigate theoretically the site occupancy of Al3+ in the fast-ion-conducting cubic-garnet Li7–3xAl3+xLa3Zr2O12 (Ia-3d) using density functional theory. By comparing calculated and measured 27Al NMR chemical shifts an analysis shows that Al3+ prefers the tetrahedrally coordinated 24d site and a distorted 4-fold coordinated 96h site. The site energies for Al3+ ions, which are slightly displaced from the exact crystallographic sites (i.e., 24d and 96h), are similar leading to a distribution of slightly different local oxygen coordination environments. Thus, broad 27Al NMR resonances result reflecting the distribution of different isotropic chemical shifts and quadrupole coupling constants. From an energetic point of view, there is evidence that Al3+ could also occupy the 48g site with its almost regular octahedral coordination sphere. Although this has been reported by neutron powder diffraction, the NMR chemical shift calculated for such an Al3+ site has not been observed experimentally. PMID:25673921

  5. Study of program defects of 22nm nanoimprint template with an advanced e-beam inspection system

    NASA Astrophysics Data System (ADS)

    Hiraka, Takaaki; Mizuochi, Jun; Nakanishi, Yuko; Yusa, Satoshi; Sasaki, Shiho; Kurihara, Masaaki; Toyama, Nobuhito; Morikawa, Yasutaka; Mohri, Hiroshi; Hayashi, Naoya; Xiao, Hong; Kuan, Chiyan; Wang, Fei; Ma, Long; Zhao, Yan; Jau, Jack

    2009-10-01

    Nanoimprint lithography (NIL) is a candidate of alternative, low cost of ownership lithography solution for deep nano-meter device manufacturing12. For the NIL template pattern making, we have been developing the processes with 100keV SB EB writer and 50keV VSB EB writer to achieve the fine resolution of near 20nm1-7. However, inspection of nanoimprint template posed a big challenge to inspection system due to the small geometry, 1x comparing to 4x of Optical mask and EUV mask. Previous studies of nanoimprint template inspection were performed indirectly on a stamped wafer and/or on a round quartz wafer13. Electron beam inspection (EBI) systems have been widely used in semiconductor fabs in nanometer technology nodes. Most commonly EBI applications are electrical defects, or voltage contrast (VC) defects detection and monitoring8-11. In this study, we used a mask EBI system developed by Hermes Microvision, Inc. (HMI) to directly inspect a NIL template with line/space and hole patterns half pitched from 22nm to 90nm and with program defects sized from 4nm to 92nm. Capability of inspection with 10nm pixel size has been demonstrated and capability of capturing program defects sized 12nm and smaller has been shown. This study proved the feasibility of EBI as inspection solution of nanoimprint template for 22nmHP and beyond.

  6. Synthesis and properties of titanomagnetite (Fe3-xTixO4) nanoparticles: A tunable solid-state Fe(II/III) redox system

    SciTech Connect

    Pearce, Carolyn I.; Qafoku, Odeta; Liu, Juan; Arenholz, Elke; Heald, Steve M.; Kukkadapu, Ravi K.; Gorski, Christopher A.; Henderson, C. Michael B.; Rosso, Kevin M.

    2012-12-01

    Titanomagnetite (Fe3-xTixO4) nanoparticles were synthesized by room temperature aqueous precipitation, in which Ti(IV) replaces Fe(III) and is charge compensated by conversion of Fe(III) to Fe(II) in the unit cell. A comprehensive suite of tools was used to probe composition, structure, and magnetic properties down to site-occupancy level, emphasizing distribution and accessibility of Fe(II) as a function of x. Synthesis of nanoparticles in the range 0 ≤ x ≤ 0.6 was attempted; Ti, total Fe and Fe(II) content were verified by chemical analysis. TEM indicated homogeneous spherical 10 12 nm particles. μ-XRD and Mössbauer spectroscopy on anoxic aqueous suspensions verified the inverse spinel structure and Ti(IV) incorporation in the unit cell up to x ≤ 0.38, based on Fe(II)/Fe(III) ratio deduced from the unit cell edge and Mössbauer spectra. Nanoparticles with a higher value of x possessed a minor amorphous secondary Fe(II)/Ti(IV) phase. XANES/EXAFS indicated Ti(IV) incorporation in the octahedral sublattice (B-site) and proportional increases in Fe(II)/Fe(III) ratio. XA/XMCD indicate these increases arise from increasing B-site Fe(II), and that these charge-balancing equivalents segregate to those B-sites near particle surfaces. Dissolution studies showed that this segregation persists after release of Fe(II) into solution, in amounts systematically proportional to x and thus the Fe(II)/Fe(III) ratio. A mechanistic reaction model was developed entailing mobile B-site Fe(II) supplying a highly interactive surface phase that undergoes interfacial electron transfer with oxidants in solution, sustained by outward Fe(II) migration from particle interiors and concurrent inward migration of charge-balancing cationic vacancies in a ratio of 3:1.

  7. Broad Wavelength Tunable Robust Lasing from Single-Crystal Nanowires of Cesium Lead Halide Perovskites (CsPbX3, X = Cl, Br, I).

    PubMed

    Fu, Yongping; Zhu, Haiming; Stoumpos, Constantinos C; Ding, Qi; Wang, Jue; Kanatzidis, Mercouri G; Zhu, Xiaoyang; Jin, Song

    2016-08-23

    Lead halide perovskite nanowires (NWs) are emerging as a class of inexpensive semiconductors with broad bandgap tunability for optoelectronics, such as tunable NW lasers. Despite exciting progress, the current organic-inorganic hybrid perovskite NW lasers suffer from limited tunable wavelength range and poor material stability. Herein, we report facile solution growth of single-crystal NWs of inorganic perovskite CsPbX3 (X = Br, Cl) and their alloys [CsPb(Br,Cl)3] and a low-temperature vapor-phase halide exchange method to convert CsPbBr3 NWs into perovskite phase CsPb(Br,I)3 alloys and metastable CsPbI3 with well-preserved perovskite crystal lattice and NW morphology. These single crystalline NWs with smooth end facets and subwavelength dimensions are ideal Fabry-Perot cavities for NW lasers. Optically pumped tunable lasing across the entire visible spectrum (420-710 nm) is demonstrated at room temperature from these NWs with low lasing thresholds and high-quality factors. Such highly efficient lasing similar to what can be achieved with organic-inorganic hybrid perovskites indicates that organic cation is not essential for light emission application from these lead halide perovskite materials. Furthermore, the CsPbBr3 NW lasers show stable lasing emission with no measurable degradation after at least 8 h or 7.2 × 10(9) laser shots under continuous illumination, which are substantially more robust than their organic-inorganic counterparts. The Cs-based perovskites offer a stable material platform for tunable NW lasers and other nanoscale optoelectronic devices. PMID:27437566

  8. Broad Wavelength Tunable Robust Lasing from Single-Crystal Nanowires of Cesium Lead Halide Perovskites (CsPbX3, X = Cl, Br, I).

    PubMed

    Fu, Yongping; Zhu, Haiming; Stoumpos, Constantinos C; Ding, Qi; Wang, Jue; Kanatzidis, Mercouri G; Zhu, Xiaoyang; Jin, Song

    2016-08-23

    Lead halide perovskite nanowires (NWs) are emerging as a class of inexpensive semiconductors with broad bandgap tunability for optoelectronics, such as tunable NW lasers. Despite exciting progress, the current organic-inorganic hybrid perovskite NW lasers suffer from limited tunable wavelength range and poor material stability. Herein, we report facile solution growth of single-crystal NWs of inorganic perovskite CsPbX3 (X = Br, Cl) and their alloys [CsPb(Br,Cl)3] and a low-temperature vapor-phase halide exchange method to convert CsPbBr3 NWs into perovskite phase CsPb(Br,I)3 alloys and metastable CsPbI3 with well-preserved perovskite crystal lattice and NW morphology. These single crystalline NWs with smooth end facets and subwavelength dimensions are ideal Fabry-Perot cavities for NW lasers. Optically pumped tunable lasing across the entire visible spectrum (420-710 nm) is demonstrated at room temperature from these NWs with low lasing thresholds and high-quality factors. Such highly efficient lasing similar to what can be achieved with organic-inorganic hybrid perovskites indicates that organic cation is not essential for light emission application from these lead halide perovskite materials. Furthermore, the CsPbBr3 NW lasers show stable lasing emission with no measurable degradation after at least 8 h or 7.2 × 10(9) laser shots under continuous illumination, which are substantially more robust than their organic-inorganic counterparts. The Cs-based perovskites offer a stable material platform for tunable NW lasers and other nanoscale optoelectronic devices.

  9. Laser damage database at 1064 nm

    SciTech Connect

    Rainer, F.; Gonzales, R.P.; Morgan, A.J.

    1990-03-01

    In conjunction with our diversification of laser damage testing capabilities, we have expanded upon a database of threshold measurements and parameter variations at 1064 nm. This includes all tests at low pulse-repetition frequencies (PRF) ranging from single shots to 120 Hz. These tests were conducted on the Reptile laser facility since 1987 and the Variable Pulse Laser (VPL) facility since 1988. Pulse durations ranged from 1 to 16 ns. 10 refs., 14 figs.

  10. Experimental study of 99mTc-aluminum oxide use for sentinel lymph nodes detection

    NASA Astrophysics Data System (ADS)

    Chernov, V. I.; Sinilkin, I. G.; Zelchan, R. V.; Medvedeva, A. A.; Lyapunov, A. Yu.; Bragina, O. D.; Varlamova, N. V.; Skuridin, V. S.

    2016-08-01

    The purpose of the study was a comparative research in the possibility of using the radiopharmaceuticals 99mTc-Al2O3 and 99mTc-Nanocis for visualizing sentinel lymph nodes. The measurement of the sizes of 99mTc-Al2O3 and 99mTc-Nanocis colloidal particles was performed in seven series of radiopharmaceuticals. The pharmacokinetics of 99mTc-Al2O3 and 99mTc-Nanocis was researched on 50 white male rats. The possibility of the use of 99mTc-Al2O3 and 99mTc-Nanocis for lymphoscintigraphy was studied in the experiments on 12 white male rats. The average dynamic diameter of the sol particle was 52-77 nm for 99mTc-Al2O3 and 16.7-24.5 nm for 99mTc-Nanocis. Radiopharmaceuticals accumulated in the inguinal lymph node in 1 hour after administration; the average uptake of 99mTc-Al2O3 was 8.6% in it, and the accumulation of 99mTc-Nanocis was significantly lower—1.8% (p < 0.05). In all study points the average uptake of 99mTc-Al2O3 in the lymph node was significantly higher than 99mTc-Nanocis accumulation. The results of dynamic scintigraphic studies in rats showed that 99mTc-Al2O3 and 99mTc-Nanocis actively accumulated into the lymphatic system. By using 99mTc-Al2O3 inguinal lymph node was determined in 5 minutes after injection and clearly visualized in all the animals in the 15th minute, when the accumulation became more than 1% of the administered dose. Further observation indicated that the 99mTc-Al2O3 accumulation reached a plateau in a lymph node (average 10.5%) during 2-hour study and then its accumulation remained practically at the same level, slightly increasing to 12% in 24 hours. In case of 99mTc-Nanocis inguinal lymph node was visualized in all animals for 15 min when it was accumulated on the average 1.03% of the administered dose. Plateau of 99mTc-Nanocis accumulation in the lymph node (average 2.05%) occurred after 2 hours of the study and remained almost on the same level (in average 2.3%) for 24 hours. Thus, the experimental study of a new domestic

  11. Regenerating a kidney in a lymph node.

    PubMed

    Francipane, Maria Giovanna; Lagasse, Eric

    2016-10-01

    The ultimate treatment for end-stage renal disease (ESRD) is orthotopic transplantation. However, the demand for kidney transplantation far exceeds the number of available donor organs. While more than 100,000 Americans need a kidney, only 17,000 people receive a kidney transplant each year (National Kidney Foundation's estimations). In recent years, several regenerative medicine/tissue engineering approaches have been exploited to alleviate the kidney shortage crisis. Although these approaches have yielded promising results in experimental animal models, the kidney is a complex organ and translation into the clinical realm has been challenging to date. In this review, we will discuss cell therapy-based approaches for kidney regeneration and whole-kidney tissue engineering strategies, including our innovative approach to regenerate a functional kidney using the lymph node as an in vivo bioreactor.

  12. Topological Dirac line nodes in centrosymmetric semimetals

    NASA Astrophysics Data System (ADS)

    Kim, Youngkuk; Wieder, Benjamin; Kane, Charles; Rappe, Andrew; TI seed Team

    Dirac line nodes (DLNs) are one-dimensional lines of Dirac band-touching points, characterized by linear dispersion in only a single direction in momentum space. In the presence of inversion symmetry and time-reversal symmetry, crystals with vanishing spin-orbit coupling can host topologically protected DLNs. Recently, we have proposed and characterized a novel Z2 class of DLN semimetals [1]. We present Z2 topological invariants, dictating the presence of DLNs, based on the parity eigenvalues at the time-reversal invariant crystal momenta. Our first-principles calculations show that DLNs can be realized in Cu3N in an anti-ReO3 structure via a metal-insulator electronic transition, driven by transition metal doping. We also discuss the resultant surface states and the effects of spin-orbit coupling.

  13. Endoscopic ultrasound: Elastographic lymph node evaluation.

    PubMed

    Dietrich, Christoph F; Jenssen, Christian; Arcidiacono, Paolo G; Cui, Xin-Wu; Giovannini, Marc; Hocke, Michael; Iglesias-Garcia, Julio; Saftoiu, Adrian; Sun, Siyu; Chiorean, Liliana

    2015-01-01

    Different imaging techniques can bring different information which will contribute to the final diagnosis and further management of the patients. Even from the time of Hippocrates, palpation has been used in order to detect and characterize a body mass. The so-called virtual palpation has now become a reality due to elastography, which is a recently developed technique. Elastography has already been proving its added value as a complementary imaging method, helpful to better characterize and differentiate between benign and malignant masses. The current applications of elastography in lymph nodes (LNs) assessment by endoscopic ultrasonography will be further discussed in this paper, with a review of the literature and future perspectives. PMID:26374575

  14. Endoscopic ultrasound: Elastographic lymph node evaluation

    PubMed Central

    Dietrich, Christoph F.; Jenssen, Christian; Arcidiacono, Paolo G.; Cui, Xin-Wu; Giovannini, Marc; Hocke, Michael; Iglesias-Garcia, Julio; Saftoiu, Adrian; Sun, Siyu; Chiorean, Liliana

    2015-01-01

    Different imaging techniques can bring different information which will contribute to the final diagnosis and further management of the patients. Even from the time of Hippocrates, palpation has been used in order to detect and characterize a body mass. The so-called virtual palpation has now become a reality due to elastography, which is a recently developed technique. Elastography has already been proving its added value as a complementary imaging method, helpful to better characterize and differentiate between benign and malignant masses. The current applications of elastography in lymph nodes (LNs) assessment by endoscopic ultrasonography will be further discussed in this paper, with a review of the literature and future perspectives. PMID:26374575

  15. Accurate mask model for advanced nodes

    NASA Astrophysics Data System (ADS)

    Zine El Abidine, Nacer; Sundermann, Frank; Yesilada, Emek; Ndiaye, El Hadji Omar; Mishra, Kushlendra; Paninjath, Sankaranarayanan; Bork, Ingo; Buck, Peter; Toublan, Olivier; Schanen, Isabelle

    2014-07-01

    Standard OPC models consist of a physical optical model and an empirical resist model. The resist model compensates the optical model imprecision on top of modeling resist development. The optical model imprecision may result from mask topography effects and real mask information including mask ebeam writing and mask process contributions. For advanced technology nodes, significant progress has been made to model mask topography to improve optical model accuracy. However, mask information is difficult to decorrelate from standard OPC model. Our goal is to establish an accurate mask model through a dedicated calibration exercise. In this paper, we present a flow to calibrate an accurate mask enabling its implementation. The study covers the different effects that should be embedded in the mask model as well as the experiment required to model them.

  16. Quantification of microvessels in canine lymph nodes.

    PubMed

    Tonar, Zbynĕk; Egger, Gunter F; Witter, Kirsti; Wolfesberger, Birgitt

    2008-10-01

    Quantification of microvessels in tumors is mostly based on counts of vessel profiles in tumor hot spots. Drawbacks of this method include low reproducibility and large interobserver variance, mainly as a result of individual differences in sampling of image fields for analysis. Our aim was to test an unbiased method for quantifying microvessels in healthy and tumorous lymph nodes of dogs. The endothelium of blood vessels was detected in paraffin sections by a combination of immunohistochemistry (von Willebrand factor) and lectin histochemistry (wheat germ agglutinin) in comparison with detection of basal laminae by laminin immunohistochemistry or silver impregnation. Systematic uniform random sampling of 50 image fields was performed during photo-documentation. An unbiased counting frame (area 113,600 microm(2)) was applied to each micrograph. The total area sampled from each node was 5.68 mm(2). Vessel profiles were counted according to stereological counting rules. Inter- and intraobserver variabilities were tested. The application of systematic uniform random sampling was compared with the counting of vessel profiles in hot spots. The unbiased estimate of the number of vessel profiles per unit area ranged from 100.5 +/- 44.0/mm(2) to 442.6 +/- 102.5/mm(2) in contrast to 264 +/- 72.2/mm(2) to 771.0 +/- 108.2/mm(2) in hot spots. The advantage of using systematic uniform random sampling is its reproducibility, with reasonable interobserver and low intraobserver variance. This method also allows for the possibility of using archival material, because staining quality is not limiting as it is for image analysis, and artifacts can easily be excluded. However, this method is comparatively time-consuming.

  17. Dirac node arcs in PtSn4

    NASA Astrophysics Data System (ADS)

    Wu, Yun; Wang, Lin-Lin; Mun, Eundeok; Johnson, D. D.; Mou, Daixiang; Huang, Lunan; Lee, Yongbin; Bud'Ko, S. L.; Canfield, P. C.; Kaminski, Adam

    2016-07-01

    In topological quantum materials the conduction and valence bands are connected at points or along lines in the momentum space. A number of studies have demonstrated that several materials are indeed Dirac/Weyl semimetals. However, there is still no experimental confirmation of materials with line nodes, in which the Dirac nodes form closed loops in the momentum space. Here we report the discovery of a novel topological structure--Dirac node arcs--in the ultrahigh magnetoresistive material PtSn4 using laser-based angle-resolved photoemission spectroscopy data and density functional theory calculations. Unlike the closed loops of line nodes, the Dirac node arc structure arises owing to the surface states and resembles the Dirac dispersion in graphene that is extended along a short line in the momentum space. We propose that this reported Dirac node arc structure is a novel topological state that provides an exciting platform for studying the exotic properties of Dirac fermions.

  18. Nanoparticle transport from mouse vagina to adjacent lymph nodes.

    PubMed

    Ballou, Byron; Andreko, Susan K; Osuna-Highley, Elvira; McRaven, Michael; Catalone, Tina; Bruchez, Marcel P; Hope, Thomas J; Labib, Mohamed E

    2012-01-01

    To test the feasibility of localized intravaginal therapy directed to neighboring lymph nodes, the transport of quantum dots across the vaginal wall was investigated. Quantum dots instilled into the mouse vagina were transported across the vaginal mucosa into draining lymph nodes, but not into distant nodes. Most of the particles were transported to the lumbar nodes; far fewer were transported to the inguinal nodes. A low level of transport was evident at 4 hr after intravaginal instillation, and transport peaked at about 36 hr after instillation. Transport was greatly enhanced by prior vaginal instillation of Nonoxynol-9. Hundreds of micrograms of nanoparticles/kg tissue (ppb) were found in the lumbar lymph nodes at 36 hr post-instillation. Our results imply that targeted transport of microbicides or immunogens from the vagina to local lymph organs is feasible. They also offer an in vivo model for assessing the toxicity of compounds intended for intravaginal use. PMID:23284844

  19. Alternative staging of regional lymph nodes in gastric cancer

    PubMed Central

    Szczepanik, Antoni M.; Paszko, Agata; Szura, Miroslaw; Scully-Horner, Thecla; Kulig, Jan

    2016-01-01

    The TNM pN stage based on the number of metastatic lymph nodes is an independent prognostic factor in gastric cancer. Many studies have highlighted the phenomenon of stage migration and problems in comparing groups of patients with different numbers of total lymph nodes harvested within TNM staging. The current version of UICC/AJCC and JGCA TNM classifications postulates a minimal number of 16 lymph nodes as the base for N stage determination. Alternative systems such as lymph node ratio (LNR), positive to negative lymph node ratio (PNLNR), and LOGODDS (or LODDS), were implemented to increase the quality of LN assessment. These methods have reached the background in the literature, but to date no standard approach according to the cut-offs for the stages has been implemented. LOGODDS is the method that most reflects the number of harvested lymph nodes. The rationale for alternative staging methods, their correlations, and limitations are presented. PMID:27713774

  20. Identification of hybrid node and link communities in complex networks

    NASA Astrophysics Data System (ADS)

    He, Dongxiao; Jin, Di; Chen, Zheng; Zhang, Weixiong

    2015-03-01

    Identifying communities in complex networks is an effective means for analyzing complex systems, with applications in diverse areas such as social science, engineering, biology and medicine. Finding communities of nodes and finding communities of links are two popular schemes for network analysis. These schemes, however, have inherent drawbacks and are inadequate to capture complex organizational structures in real networks. We introduce a new scheme and an effective approach for identifying complex mixture structures of node and link communities, called hybrid node-link communities. A central piece of our approach is a probabilistic model that accommodates node, link and hybrid node-link communities. Our extensive experiments on various real-world networks, including a large protein-protein interaction network and a large network of semantically associated words, illustrated that the scheme for hybrid communities is superior in revealing network characteristics. Moreover, the new approach outperformed the existing methods for finding node or link communities separately.