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Sample records for 6h-sic epitaxial layers

  1. Atomic layer epitaxy

    NASA Astrophysics Data System (ADS)

    Goodman, Colin H. L.; Pessa, Markus V.

    1986-08-01

    Atomic layer epitaxy (ALE) is not so much a new technique for the preparation of thin films as a novel modification to existing methods of vapor-phase epitaxy, whether physical [e.g., evaporation, at one limit molecular-beam epitaxy (MBE)] or chemical [e.g., chloride epitaxy or metalorganic chemical vapor deposition (MOCVD)]. It is a self-regulatory process which, in its simplest form, produces one complete molecular layer of a compound per operational cycle, with a greater thickness being obtained by repeated cycling. There is no growth rate in ALE as in other crystal growth processes. So far ALE has been applied to rather few materials, but, in principle, it could have a quite general application. It has been used to prepare single-crystal overlayers of CdTe, (Cd,Mn)Te, GaAs and AlAs, a number of polycrystalline films and highly efficient electroluminescent thin-film displays based on ZnS:Mn. It could also offer particular advantages for the preparation of ultrathin films of precisely controlled thickness in the nanometer range and thus may have a special value for growing low-dimensional structures.

  2. Method of depositing epitaxial layers on a substrate

    DOEpatents

    Goyal, Amit

    2003-12-30

    An epitaxial article and method for forming the same includes a substrate having a textured surface, and an electrochemically deposited substantially single orientation epitaxial layer disposed on and in contact with the textured surface. The epitaxial article can include an electromagnetically active layer and an epitaxial buffer layer. The electromagnetically active layer and epitaxial buffer layer can also be deposited electrochemically.

  3. Epitaxial growth of silicon for layer transfer

    SciTech Connect

    Teplin, Charles; Branz, Howard M

    2015-03-24

    Methods of preparing a thin crystalline silicon film for transfer and devices utilizing a transferred crystalline silicon film are disclosed. The methods include preparing a silicon growth substrate which has an interface defining substance associated with an exterior surface. The methods further include depositing an epitaxial layer of silicon on the silicon growth substrate at the surface and separating the epitaxial layer from the substrate substantially along the plane or other surface defined by the interface defining substance. The epitaxial layer may be utilized as a thin film of crystalline silicon in any type of semiconductor device which requires a crystalline silicon layer. In use, the epitaxial transfer layer may be associated with a secondary substrate.

  4. Sequential imposed layer epitaxy of cuprate films

    SciTech Connect

    Laguees, M.; Tebbji, H.; Mairet, V.; Hatterer, C.; Beuran, C.F.; Hass, N.; Xu, X.Z. ); Cavellin, C.D. )

    1994-02-01

    Layer-by-layer epitaxy has been used to grow cuprate films since the discovery of high-Tc compounds. This deposition technique is in principle suitable for the growth of layered crystalline structures. However, the sequential deposition of atomic layer by atomic layer of cuprate compounds has presently not been optimized. Nevertheless, this deposition process is the only one which allows one to build artificial cell structures such as Bi[sub 2]Sr[sub 2]Ca[sub (n[minus]1)]Cu[sub n]O[sub y] with n as large as 10. This process will also be the best one to grow films of the so-called infinite layer phase compounds belonging to the Sr[sub 1[minus]x]Ca[sub x]CuO[sub 2] family, in order to improve the transport properties and the morphological properties of the cuprate films. When performed at high substrate temperature (typically more than 600[degree]C), the layer-by-layer epitaxy of cuprates exhibits usually 3D aggregate nucleation. Then the growth of the film no longer obeys the layer-by-layer sequence imposed during the deposition. We present here two experimental situations of true 2D sequential imposed layer epitaxy; the growth at 500[degree]C under atomic oxygen pressure of Bi[sub 2]Sr[sub 2]CuO[sub 6] and of Sr[sub 1[minus]x]Ca[sub y]CuO[sub 2] phases. 20 refs., 2 figs.

  5. Electron holography of devices with epitaxial layers

    SciTech Connect

    Gribelyuk, M. A. Ontalus, V.; Baumann, F. H.; Zhu, Z.; Holt, J. R.

    2014-11-07

    Applicability of electron holography to deep submicron Si devices with epitaxial layers is limited due to lack of the mean inner potential data and effects of the sample tilt. The mean inner potential V{sub 0} = 12.75 V of the intrinsic epitaxial SiGe was measured by electron holography in devices with Ge content C{sub Ge} = 18%. Nanobeam electron diffraction analysis performed on the same device structure showed that SiGe is strain-free in [220] direction. Our results showed good correlation with simulations of the mean inner potential of the strain-free SiGe using density function theory. A new method is proposed in this paper to correct electron holography data for the overlap of potentials of Si and the epitaxial layer, which is caused by the sample tilt. The method was applied to the analysis of the dopant diffusion in p-Field-effect Transistor devices with the identical gate length L = 30 nm, which had alternative SiGe geometry in the source and drain regions and was subjected to different thermal processing. Results have helped to understand electrical data acquired from the same devices in terms of dopant diffusion.

  6. Atomic layer-by-layer epitaxy of cuprate superconductors

    SciTech Connect

    Bozovic, I.; Eckstein, J.N.; Virshup, G.F.

    1994-03-01

    A technique for atomic layer-by-layer epitaxy of cuprate superconductors and other complex oxides has been developed at Varian. The samples are engineered by stacking molecular layers of different compounds to assemble multilayers and superlattices, by adding or omitting atomic monolayers to create novel compounds, and by doping within specified atomic monolayers. Apart form manufacturing trilayer Josephson junctions with I{sub c}R{sub n}>5 mV, this technique enables one to address fundamental issues such as the dimensionality of HTSC state, existence of long-range proximity effects, occurrence of resonant tunneling etc., as well as to synthesize novel metastable HTSC compounds. 4 refs., 2 figs.

  7. Thermal Conductance of Nanoscale VOx Epitaxial Layers

    NASA Astrophysics Data System (ADS)

    Oh, Dong-Wook; Petrov, Ivan; Cahill, David

    2010-03-01

    We use time-domain thermoreflectance to measure the thermal conductance of VOx layers in epitaxial Pt/VOx/Pt structures. In particular, the metal-insulator-transition of VO2 at 70^oC allows us to systematically explore channels for heat transport between metals and correlated-electron systems. Pt/VOx/Pt layers are deposited on a sapphire substrates by reactive DC sputtering with O2 partial pressure varied from 0% to 13%. The thermal conductance has a strong dependence on thickness, 3-50 nm, and oxygen content, pure V to V2O5. The thermal conductance of ˜10 nm thick layers of V in series with the two Pt/V interfaces is 1 GW/m^2-K, comparable to what is expected based on the diffuse-mismatch model for electron transport at interfaces. The conductance of ˜10 nm thick layers of VO2 at room temperatures is remarkably high, 0.5 GW/m^2-K, for the series conductance of two metal-dielectric interfaces. At the metal-insulator-transition, the conductance of VO2 layers increases by only 10%, indicating that electrons in Pt and electrons in metallic VO2 are not strongly coupled.

  8. Ion implantation processing of GaN epitaxial layers

    SciTech Connect

    Tan, H.H.; Williams, J.S.; Zou, J.; Cockayne, D.J.H.; Pearton, S.J.; Yuan, C.

    1996-12-31

    Ion implantation induced-damage build up in epitaxial GaN layers grown on sapphire has been analyzed by ion channeling and electron microscopy techniques. The epitaxial layers are extremely resistant to ion beam damage in that substantial dynamic annealing of implantation disorder occurs even at liquid nitrogen temperatures. Amorphous layers can be formed in some cases if the implantation dose is high enough. However, the damage (amorphous or complex extended defects) that is formed is also extremely difficult to remove during annealing and required temperatures in excess of 1,100 C.

  9. Depositing spacing layers on magnetic film with liquid phase epitaxy

    NASA Technical Reports Server (NTRS)

    Moody, J. W.; Shaw, R. W.; Sanfort, R. M.

    1975-01-01

    Liquid phase epitaxy spacing layer is compatible with systems which are hard-bubble proofed by use of second magnetic garnet film as capping layer. Composite is superior in that: circuit fabrication time is reduced; adherence is superior; visibility is better; and, good match of thermal expansion coefficients is provided.

  10. Strained-layer epitaxy of germanium-silicon alloys.

    PubMed

    Bean, J C

    1985-10-11

    Despite the dominant position of silicon in semiconductor electronics, its use is ultimately limited by its incompatibility with other semiconducting materials. Strained-layer epitaxy overcomes problems of crystallographic compatibility and produces high-quality heterostructures of germanium-silicon layers on silicon. This opens the door to a range of electronic and photonic devices that are based on bandstructure physics. PMID:17842673

  11. An ultra-thin buffer layer for Ge epitaxial layers on Si

    SciTech Connect

    Kawano, M.; Yamada, S.; Tanikawa, K.; Miyao, M.; Hamaya, K.; Sawano, K.

    2013-03-25

    Using an Fe{sub 3}Si insertion layer, we study epitaxial growth of Ge layers on a Si substrate by a low-temperature molecular beam epitaxy technique. When we insert only a 10-nm-thick Fe{sub 3}Si layer in between Si and Ge, epitaxial Ge layers can be obtained on Si. The detailed structural characterizations reveal that a large lattice mismatch of {approx}4% is completely relaxed in the Fe{sub 3}Si layer. This means that the Fe{sub 3}Si layers can become ultra-thin buffer layers for Ge on Si. This method will give a way to realize a universal buffer layer for Ge, GaAs, and related devices on a Si platform.

  12. Seed layer technique for high quality epitaxial manganite films

    NASA Astrophysics Data System (ADS)

    Graziosi, P.; Gambardella, A.; Calbucci, M.; O'Shea, K.; MacLaren, D. A.; Riminucci, A.; Bergenti, I.; Fugattini, S.; Prezioso, M.; Homonnay, N.; Schmidt, G.; Pullini, D.; Busquets-Mataix, D.; Dediu, V.

    2016-08-01

    We introduce an innovative approach to the simultaneous control of growth mode and magnetotransport properties of manganite thin films, based on an easy-to-implement film/substrate interface engineering. The deposition of a manganite seed layer and the optimization of the substrate temperature allows a persistent bi-dimensional epitaxy and robust ferromagnetic properties at the same time. Structural measurements confirm that in such interface-engineered films, the optimal properties are related to improved epitaxy. A new growth scenario is envisaged, compatible with a shift from heteroepitaxy towards pseudo-homoepitaxy. Relevant growth parameters such as formation energy, roughening temperature, strain profile and chemical states are derived.

  13. Surface morphological evolution of epitaxial CrN(001) layers

    SciTech Connect

    Frederick, J.R.; Gall, D.

    2005-09-01

    CrN layers, 57 and 230 nm thick, were grown on MgO(001) at T{sub s}=600-800 deg. C by ultrahigh-vacuum magnetron sputter deposition in pure N{sub 2} discharges from an oblique deposition angle {alpha}=80 deg. . Layers grown at 600 deg. C nucleate as single crystals with a cube-on-cube epitaxial relationship with the substrate. However, rough surfaces with cauliflower-type morphologies cause the nucleation of misoriented CrN grains that develop into cone-shaped grains that protrude out of the epitaxial matrix to form triangular faceted surface mounds. The surface morphology of epitaxial CrN(001) grown at 700 deg. C is characterized by dendritic ridge patterns extending along the orthogonal <110> directions superposed by square-shaped super mounds with <100> edges. The ridge patterns are attributed to a Bales-Zangwill instability while the supermounds form due to atomic shadowing which leads to the formation of epitaxial inverted pyramids that are separated from the surrounding layer by tilted nanovoids. Growth at 800 deg. C yields complete single crystals with smooth surfaces. The root-mean-square surface roughness for 230-nm-thick layers decreases from 18.8 to 9.3 to 1.1 nm as T{sub s} is raised from 600 to 700 to 800 deg. C. This steep decrease is due to a transition in the roughening mechanism from atomic shadowing to kinetic roughening. Atomic shadowing is dominant at 600 and 700 deg. C, where misoriented grains and supermounds, respectively, capture a larger fraction of the oblique deposition flux in comparison to the surrounding epitaxial matrix, resulting in a high roughening rate that is described by a power law with an exponent {beta}>0.5. In contrast, kinetic roughening controls the surface morphology for T{sub s}=800 deg. C, as well as the epitaxial fraction of the layers grown at 600 and 700 deg. C, yielding relatively smooth surfaces and {beta}{<=}0.27.

  14. Evolving surface cusps during strained-layer epitaxy

    SciTech Connect

    Jesson, D.E.; Pennycook, S.J.; Baribeau, J.M.; Houghton, D.C.

    1993-04-01

    We have combined Z-contrast imaging and Ge marker layer experiments to study the evolving surface morphology of Si{sub x}Ge{sub 1-x} alloys grown by molecular beam epitaxy (MBE). Surface cusps are seen to arise as the intersection lines between coherent islands. The potential implications of stress concentrations associated with cusps are considered with a view to strain relaxation in the film via dislocation nucleation.

  15. Molecular Beam Epitaxy of Layered Material Superlattices and Heterostructures

    NASA Astrophysics Data System (ADS)

    Vishwanath, Suresh; Liu, Xinyu; Rouvimov, Sergei; Furdyna, Jacek K.; Jena, Debdeep; Xing, Huili Grace

    2014-03-01

    Stacking of various layered materials is being pursued widely to realize various devices and observe novel physics. Mostly, these have been limited to exfoliation and stacking either manually or in solution, where control on rotational alignment or order of stacking is lost. We have demonstrated molecular beam epitaxy (MBE) growth of Bi2Se3/MoSe2 superlatticeand Bi2Se3/MoSe2/SnSe2 heterostructure on sapphire. We have achieved a better control on the order of stacking and number of layers as compared to the solution technique. We have characterized these structures using RHEED, Raman spectroscopy, XPS, AFM, X-ray reflectometry, cross-section (cs) and in-plane (ip) TEM. The rotational alignment is dictated by thermodynamics and is understood using ip-TEM diffraction patterns. Layered growth and long range order is evident from the streaky RHEED pattern. Abrupt change in RHEED pattern, clear demarcation of boundary between layers seen using cs-TEM and observation of Raman peaks corresponding to all the layers suggest van-der-waals epitaxy. In our knowledge this is a first demonstration of as grown superlattices and heterostuctures involving transition metal dichalcogenides and is an important step towards the goal of stacking of 2D crystals like lego blocks.

  16. Microstructures of aluminum gallium nitride epitaxial layers

    NASA Astrophysics Data System (ADS)

    Wise, Adam

    Stress relief mechanisms and microstructures of AlxGa 1-xN thin films were investigated by growing samples by MBE and MOCVD. For investigation of stress relief mechanisms, a series of eight GaN samples were grown using MOCVD with AlxGa1-xN interlayers ranging from xAl=0.14 to xAl=1. Each successive interlayer in a given sample was increased in thickness and followed by a GaN probe-layer. A multi-beam optical stress sensor (MOSS) was used to monitor the stress in the sample during the growth process and determine the onset of stress relaxation. The thicknesses determined for stress relief onset in the interlayers were compared with calculations of Griffith's Criterion for hexagonal thin films and found to closely follow the predicted thicknesses of surface crack formation. For investigation of microstructures in AlxGa1-xN thin films, several sets of samples were grown by MOCVD, with varying pressure, temperature, and composition, and by MBE with varying temperature. The samples were examined by transmission electron microscopy, including [101¯0] selected area electron diffraction (SAED) patterns and weak beam dark field images taken with g=(0002) and g=(1¯21¯0). The MOCVD samples with composition variation were examined with [112¯0] SAED patterns, and the MBE-grown samples were examined using z-contrast imaging. All the MOCVD samples showed signs of ordering, while none of the MBE-grown samples did. In addition, the ordering was shown to be forming as thin plates of ordered material on the (0001) planes, anisotropic within the plane. Some MBE-grown samples were shown to have strong composition modulations arranged in bands arranged parallel to the surface of the sample, due to a balance between strain energy in the samples and the interfacial energy occurring between regions of high and low xAl. The samples grown by MOCVD were shown to have signs of phase separation in addition to the ordering observed. These samples show enhanced ordering in the system when

  17. Impact of hydrogen surfactant on crystallinity of Ge1-xSnx epitaxial layers

    NASA Astrophysics Data System (ADS)

    Asano, Takanori; Taoka, Noriyuki; Hozaki, Koya; Takeuchi, Wakana; Sakashita, Mitsuo; Nakatsuka, Osamu; Zaima, Shigeaki

    2015-04-01

    The effect of a hydrogen surfactant on the crystallinity of a Ge1-xSnx epitaxial layer was investigated. The improvement of crystallinity on the in-plane uniformity of Ge1-xSnx epitaxial layer was observed by X-ray diffuse scattering and transmission electron microscopy. We also observed the decrease in the surface roughness of the Ge1-xSnx epitaxial layer. This indicates the suppression of the three-dimensional growth mode of Ge1-xSnx epitaxial layer due to a compressive strain. In addition, we observed the reduction in acceptor-like defect density in an undoped-Ge1-xSnx epitaxial layer from the capacitance-voltage characteristics of a metal-oxide-semiconductor capacitor. Consequently, introducing hydrogen during the growth leads to the improvement of the crystalline quality of the Ge1-xSnx epitaxial layer.

  18. High quality GaN-based LED epitaxial layers grown in a homemade MOCVD system

    NASA Astrophysics Data System (ADS)

    Haibo, Yin; Xiaoliang, Wang; Junxue, Ran; Guoxin, Hu; Lu, Zhang; Hongling, Xiao; Jing, Li; Jinmin, Li

    2011-03-01

    A homemade 7 × 2 inch MOCVD system is presented. With this system, high quality GaN epitaxial layers, InGaN/GaN multi-quantum wells and blue LED structural epitaxial layers have been successfully grown. The non-uniformity of undoped GaN epitaxial layers is as low as 2.86%. Using the LED structural epitaxial layers, blue LED chips with area of 350 × 350 μm2 were fabricated. Under 20 mA injection current, the optical output power of the blue LED is 8.62 mW.

  19. MOS structures based on epitaxial HgCdTe layers

    SciTech Connect

    Antonov, V.V.; Belashov, Y.G.; Kazak, E.P.; Mezentseva, M.P.; Voitsekhovskii, A.V.

    1985-08-01

    The authors present the results of a study of the dependence of the surface photoelectromotive force at wavelengths of 3.39 and 10.6 micrometers on the field electrode for MOS structures prepared from epitaxial Hg /SUB 1-x/ Cd /SUB x/ Te layers (x=0.20-0.25). They analyze the nature of the inhomogeneities in the region near the surface of semiconducting samples prepared under various heat treatment conditions and present their findings in a series of three charts.

  20. Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy

    SciTech Connect

    Nepal, N.; Qadri, S. B.; Hite, J. K.; Mahadik, N. A.; Mastro, M. A.; Eddy, C. R. Jr.

    2013-08-19

    Thin AlN layers were grown at 200–650 °C by plasma assisted atomic layer epitaxy (PA-ALE) simultaneously on Si(111), sapphire (1120), and GaN/sapphire substrates. The AlN growth on Si(111) is self-limited for trimethyaluminum (TMA) pulse of length > 0.04 s, using a 10 s purge. However, the AlN nucleation on GaN/sapphire is non-uniform and has a bimodal island size distribution for TMA pulse of ≤0.03 s. The growth rate (GR) remains almost constant for T{sub g} between 300 and 400 °C indicating ALE mode at those temperatures. The GR is increased by 20% at T{sub g} = 500 °C. Spectroscopic ellipsometry (SE) measurement shows that the ALE AlN layers grown at T{sub g} ≤ 400 °C have no clear band edge related features, however, the theoretically estimated band gap of 6.2 eV was measured for AlN grown at T{sub g} ≥ 500 °C. X-ray diffraction measurements on 37 nm thick AlN films grown at optimized growth conditions (T{sub g} = 500 °C, 10 s purge, 0.06 s TMA pulse) reveal that the ALE AlN on GaN/sapphire is (0002) oriented with rocking curve full width at the half maximum (FWHM) of 670 arc sec. Epitaxial growth of crystalline AlN layers by PA-ALE at low temperatures broadens application of the material in the technologies that require large area conformal growth at low temperatures with thickness control at the atomic scale.

  1. Layer Resolved Imaging of Magnetic Domain Motion in Epitaxial Heterostructures

    NASA Astrophysics Data System (ADS)

    Zohar, Sioan; Choi, Yongseong; Love, David; Mansell, Rhodri; Barnes, Crispin; Keavney, David; Rosenberg, Richard

    We use X-ray Excited Luminescence Microscopy (XELM) to image the elemental and layer resolved magnetic domain structure of an epitaxial Fe/Cr wedge/Co heterostructure in the presence of large magnetic fields. The observed magnetic domains exhibit several unique behaviors that depend on the Cr thickness (tCr) modulated interlayer exchange coupling (IEC) strength. For Cr thickness tCr??1.5?nm, strongly coupled parallel Co-Fe reversal and weakly coupled layer independent reversal are observed, respectively. The transition between these two reversal mechanisms for 0.34?

  2. Particle detectors based on semiconducting InP epitaxial layers

    NASA Astrophysics Data System (ADS)

    Yatskiv, R.; Grym, J.; Zdansky, K.

    2011-01-01

    A study of electrical properties and detection performance of two types of Indium Phosphide detector structures was performed: (i) with p-n-junction and (ii) with Schottky contact prepared on high purity p-type InP. The p-n junction detectors were based on a high purity InP:Pr layers of both n- and p- type conductivity with carrier concentration on the order of 1014 cm-3 grown on Sn doped n-type substrate. Schottky barrier detectors were prepared by vacuum evaporation of Pd on high purity p-type epitaxial layer grown on Mn doped p-type substrate. The detection performance of particle detectors was measured by pulse-height spectra with alpha particles emitted from 241Am source at room temperature.

  3. Interface engineering in epitaxial growth of layered oxides via a conducting layer insertion

    SciTech Connect

    Yun, Yu; Meng, Dechao; Wang, Jianlin; Ma, Chao; Zhai, Xiaofang; Huang, Haoliang; Fu, Zhengping; Peng, Ranran; Brown, Gail J.; and others

    2015-07-06

    There is a long-standing challenge in the fabrication of layered oxide epitaxial films due to their thermodynamic phase-instability and the large stacking layer number. Recently, the demand for high-quality thin films is strongly pushed by their promising room-temperature multiferroic properties. Here, we find that by inserting a conducting and lattice matched LaNiO{sub 3} buffer layer, high quality m = 5 Bi{sub 6}FeCoTi{sub 3}O{sub 18} epitaxial films can be fabricated using the laser molecular beam epitaxy, in which the atomic-scale sharp interface between the film and the metallic buffer layer explains the enhanced quality. The magnetic and ferroelectric properties of the high quality Bi{sub 6}FeCoTi{sub 3}O{sub 18} films are studied. This study demonstrates that insertion of the conducting layer is a powerful method in achieving high quality layered oxide thin films, which opens the door to further understand the underline physics and to develop new devices.

  4. Chemical gating of epitaxial graphene through ultrathin oxide layers

    NASA Astrophysics Data System (ADS)

    Larciprete, Rosanna; Lacovig, Paolo; Orlando, Fabrizio; Dalmiglio, Matteo; Omiciuolo, Luca; Baraldi, Alessandro; Lizzit, Silvano

    2015-07-01

    We achieved a controllable chemical gating of epitaxial graphene grown on metal substrates by exploiting the electrostatic polarization of ultrathin SiO2 layers synthesized below it. Intercalated oxygen diffusing through the SiO2 layer modifies the metal-oxide work function and hole dopes graphene. The graphene/oxide/metal heterostructure behaves as a gated plane capacitor with the in situ grown SiO2 layer acting as a homogeneous dielectric spacer, whose high capacity allows the Fermi level of graphene to be shifted by a few hundreds of meV when the oxygen coverage at the metal substrate is of the order of 0.5 monolayers. The hole doping can be finely tuned by controlling the amount of interfacial oxygen, as well as by adjusting the thickness of the oxide layer. After complete thermal desorption of oxygen the intrinsic doping of SiO2 supported graphene is evaluated in the absence of contaminants and adventitious adsorbates. The demonstration that the charge state of graphene can be changed by chemically modifying the buried oxide/metal interface hints at the possibility of tuning the level and sign of doping by the use of other intercalants capable of diffusing through the ultrathin porous dielectric and reach the interface with the metal.We achieved a controllable chemical gating of epitaxial graphene grown on metal substrates by exploiting the electrostatic polarization of ultrathin SiO2 layers synthesized below it. Intercalated oxygen diffusing through the SiO2 layer modifies the metal-oxide work function and hole dopes graphene. The graphene/oxide/metal heterostructure behaves as a gated plane capacitor with the in situ grown SiO2 layer acting as a homogeneous dielectric spacer, whose high capacity allows the Fermi level of graphene to be shifted by a few hundreds of meV when the oxygen coverage at the metal substrate is of the order of 0.5 monolayers. The hole doping can be finely tuned by controlling the amount of interfacial oxygen, as well as by adjusting

  5. Optimization of epitaxial layer design for high brightness tapered lasers

    NASA Astrophysics Data System (ADS)

    Tijero, J. M. G.; Rodriguez, D.; Borruel, L.; Sujecki, S.; Larkins, E. C.; Esquivias, I.

    2005-04-01

    A comparative simulation study of the optical output characteristics of tapered lasers with different epitaxial structure was performed. The simulation model self-consistently solves the steady state electrical and optical equations for the flared unstable resonator and was previously backed by experiments on one of the simulated structures. Three different epitaxial designs emitting at 975 nm were analyzed: a standard single quantum well symmetrically located in the confinement region (s-SQW), a double quantum well also symmetrically located (s-DQW) and an asymmetrically located double quantum well (a-DQW). The symmetric structures have different confinement factor but a similar ratio between the active layer thickness and the confinement factor, dQW/Γ, while the a-DQW has similar confinement factor than the s-SQW, but double dQW/Γ. A better performance is predicted for the a-DQW design, reaching considerably higher output power with good beam quality. The results are interpreted in terms of a lower density of power in the QW in the case of the a-DQW design, thus delaying to higher output power the onset of the non-linear effects that degrade the beam quality. The role of dQW/Γ as a figure of merit for high brightness tapered lasers is emphasized.

  6. Chemical gating of epitaxial graphene through ultrathin oxide layers.

    PubMed

    Larciprete, Rosanna; Lacovig, Paolo; Orlando, Fabrizio; Dalmiglio, Matteo; Omiciuolo, Luca; Baraldi, Alessandro; Lizzit, Silvano

    2015-08-01

    We achieved a controllable chemical gating of epitaxial graphene grown on metal substrates by exploiting the electrostatic polarization of ultrathin SiO2 layers synthesized below it. Intercalated oxygen diffusing through the SiO2 layer modifies the metal-oxide work function and hole dopes graphene. The graphene/oxide/metal heterostructure behaves as a gated plane capacitor with the in situ grown SiO2 layer acting as a homogeneous dielectric spacer, whose high capacity allows the Fermi level of graphene to be shifted by a few hundreds of meV when the oxygen coverage at the metal substrate is of the order of 0.5 monolayers. The hole doping can be finely tuned by controlling the amount of interfacial oxygen, as well as by adjusting the thickness of the oxide layer. After complete thermal desorption of oxygen the intrinsic doping of SiO2 supported graphene is evaluated in the absence of contaminants and adventitious adsorbates. The demonstration that the charge state of graphene can be changed by chemically modifying the buried oxide/metal interface hints at the possibility of tuning the level and sign of doping by the use of other intercalants capable of diffusing through the ultrathin porous dielectric and reach the interface with the metal. PMID:26148485

  7. Local epitaxial growth of ZrO2 on Ge (100) substrates by atomic layer epitaxy

    NASA Astrophysics Data System (ADS)

    Kim, Hyoungsub; Chui, Chi On; Saraswat, Krishna C.; McIntyre, Paul C.

    2003-09-01

    High-k dielectric deposition processes for gate dielectric preparation on Si surfaces usually result in the unavoidable and uncontrolled formation of a thin interfacial oxide layer. Atomic layer deposition of ˜55-Å ZrO2 film on a Ge (100) substrate using ZrCl4 and H2O at 300 °C was found to produce local epitaxial growth [(001) Ge//(001) ZrO2 and [100] Ge//[100] ZrO2] without a distinct interfacial layer, unlike the situation observed when ZrO2 is deposited using the same method on Si. Relatively large lattice mismatch (˜10%) between ZrO2 and Ge produced a high areal density of interfacial misfit dislocations. Large hysteresis (>200 mV) and high frequency dispersion were observed in capacitance-voltage measurements due to the high density of interface states. However, a low leakage current density, comparable to values obtained on Si substrates, was observed with the same capacitance density regardless of the high defect density.

  8. Schottky barriers based on metal nanoparticles deposited on InP epitaxial layers

    NASA Astrophysics Data System (ADS)

    Grym, Jan; Yatskiv, Roman

    2013-04-01

    Fabrication of high-quality Schottky barriers on InP epitaxial layers prepared by liquid-phase epitaxy from rare-earth treated melts is reported. The Schottky structures are based on metal nanoparticles and a graphite layer deposited from colloidal solutions onto epitaxial layers with varying carrier concentration. The structures have notably high values of the barrier height and of the rectification ratio giving evidence of a small degree of the Fermi-level pinning. Electrical characteristics of these diodes are shown to be extremely sensitive to the exposure of gas mixtures with small hydrogen content.

  9. The morphology of an epitaxial Mg Al spinel layer on a sapphire surface

    NASA Astrophysics Data System (ADS)

    Liu, Che-Ming; Chen, Jyh-Chen; Chen, Chun-Jen

    2006-07-01

    In this work an epitaxial Mg-Al spinel layer was successfully grown on a C- and A-plane sapphire single crystal surface by solid-state reactions. When observed by a scanning electron microscope, it can be seen that the morphology of an epitaxial spinel layer surface has a three-fold symmetrical structure. The results of X-ray diffraction analysis indicate that the surface morphology of the epitaxial spinel layer has particular crystallographic directions and the crystallographic directions will be influenced by the orientation of the sapphire substrates.

  10. Photoluminescence properties of ZnTe layers grown by photo-assisted metalorganic vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Gheyas, Syed Irfan; Ikejiri, Makoto; Ogata, Toshihiro; Ogawa, Hiroshi; Nishio, Mitsuhiro

    1994-12-01

    Effects of light illumination on the photoluminescence (PL) properties of ZnTe has been investigated by using epitaxial layers grown with different carrier gases, transport rate of source materials and light sources or by introducing triethylaluminum (TEAl) as a dopant. Free exciton emission can be observed in only the epitaxial layers grown with illumination under H 2 atmosphere, implying that the illumination is effective for the growth of good quality ZnTe layers. The illumination strengthens the transition due to excitons bound to donor impurities, namely Cl which is substituted into Te lattice site, at low substrate temperature. These effects are closely related to the use of photons having an energy higher than the bandgap of ZnTe. It seems that the photo-assisted metalorganic vapor phase epitaxy (MOVPE) technique also brings about the effective formation of Al donor by suppressing the generation of the complex of Al and Zn-vacancy in the ZnTe epitaxial layer.

  11. Epitaxially guided assembly of collagen layers on mica surfaces.

    PubMed

    Leow, Wee Wen; Hwang, Wonmuk

    2011-09-01

    Ordered assembly of collagen molecules on flat substrates has potential for various applications and serves as a model system for studying the assembly process. While previous studies demonstrated self-assembly of collagen on muscovite mica into highly ordered layers, the mechanism by which different conditions affect the resulting morphology remains to be elucidated. Using atomic force microscopy, we follow the assembly of collagen on muscovite mica at a concentration lower than the critical fibrillogenesis concentration in bulk. Initially, individual collagen molecules adsorb to mica and subsequently nucleate into fibrils possessing the 67 nm D-periodic bands. Emergence of fibrils aligned in parallel despite large interfibril distances agrees with an alignment mechanism guided by the underlying mica. The epitaxial growth was further confirmed by the formation of novel triangular networks of collagen fibrils on phlogopite mica, whose surface lattice is known to have a hexagonal symmetry, whereas the more widely used muscovite does not. Comparing collagen assembly on the two types of mica at different potassium concentrations revealed that potassium binds to the negatively charged mica surface and neutralizes it, thereby reducing the binding affinity of collagen and enhancing surface diffusion. These results suggest that collagen assembly on mica follows the surface adsorption, diffusion, nucleation, and growth pathway, where the growth direction is determined at the nucleation step. Comparison with other molecules that assemble similarly on mica supports generality of the proposed assembly mechanism, the knowledge of which will be useful for controlling the resulting surface morphologies. PMID:21740026

  12. Epitaxial growth of tungsten layers on MgO(001)

    SciTech Connect

    Zheng, Pengyuan; Ozsdolay, Brian D.; Gall, Daniel

    2015-11-15

    Smooth single crystal W(001) layers were grown on MgO(001) substrates by magnetron sputtering at 900 °C. X-ray diffraction ω–2θ scans, ω-rocking curves, pole figures, and reciprocal space maps indicate a 45°-rotated epitaxial relationship: (001){sub W}‖(001){sub MgO} and [010]{sub W}‖[110]{sub MgO}, and a relaxed lattice constant of 3.167 ± 0.001 nm. A residual in-plane biaxial compressive strain is primarily attributed to differential thermal contraction after growth and decreases from −0.012 ± 0.001 to −0.001 ± 0.001 with increasing layer thickness d = 4.8–390 nm, suggesting relaxation during cooling by misfit dislocation growth through threading dislocation glide. The in-plane x-ray coherence length increases from 3.4 to 33.6 nm for d = 4.8–390 nm, while the out-of-plane x-ray coherence length is identical to the layer thickness for d ≤ 20 nm, but is smaller than d for d ≥ 49.7 nm, indicating local strain variations along the film growth direction. X-ray reflectivity analyses indicate that the root-mean-square surface roughness increases from 0.50 ± 0.05 to 0.95 ± 0.05 nm for d = 4.8–19.9 nm, suggesting a roughness exponent of 0.38, but remains relatively constant for d > 20 nm with a roughness of 1.00 ± 0.05 nm at d = 47.9 nm.

  13. Microstructures of mixed group III-nitride epitaxial layers

    NASA Astrophysics Data System (ADS)

    Westmeyer, Andrew Nathan

    InGaN and AlGaN epitaxial layers were deposited by metalorganic chemical vapor deposition on sapphire substrates with GaN buffer layers. For the growth of InGaN at a given temperature, the trimethylgallium flow rate has the greatest influence on the In incorporation, whereas the trimethylindium flow rate has little influence. These effects are attributed to the suppression of In desorption by increasing the growth rate and the saturation of the surface with In adatoms, respectively. If the growth temperature is increased by 2.4°C, then the In content is lowered by 1% for the investigated temperature range of 785--845°C. For the growth of AlGaN, the solid fraction of Al has a sub-linear dependence on the gas composition. This was attributed to the composition pulling effect, in which incoming species are rejected in order to reduce the strain with the underlying buffer layer. A strain analysis was performed on all samples by X-ray diffraction in order to determine the composition and degree of relaxation. These values were compared to those obtained by Rutherford backscattering spectroscopy. By this method the varied reported values for elastic constants were evaluated to ascertain which set provided the best correlation. Transmission electron microscopy was performed. Plan-view images of InGaN contain domains differing in the direction of the modulations. Zone-axis diffraction patterns reveal sidebands adjacent to several Bragg reflections. These observations can be explained by diffraction effects resulting from periodic composition modulations, which are an intermediate stage in the process of phase separation. Since Young's modulus for the nitrides is isotropic in the (0001) plane, no particular direction is favored for the modulations based on strain energy considerations. In the case of AlGaN, periodic composition modulations are observed not in the growth plane (0001) but in the growth direction [0001]. Satellites in diffraction patterns are aligned in this

  14. Process for forming epitaxial perovskite thin film layers using halide precursors

    DOEpatents

    Clem, Paul G.; Rodriguez, Mark A.; Voigt, James A.; Ashley, Carol S.

    2001-01-01

    A process for forming an epitaxial perovskite-phase thin film on a substrate. This thin film can act as a buffer layer between a Ni substrate and a YBa.sub.2 Cu.sub.3 O.sub.7-x superconductor layer. The process utilizes alkali or alkaline metal acetates dissolved in halogenated organic acid along with titanium isopropoxide to dip or spin-coat the substrate which is then heated to about 700.degree. C. in an inert gas atmosphere to form the epitaxial film on the substrate. The YBCO superconductor can then be deposited on the layer formed by this invention.

  15. Fabrication of magnetic tunnel junctions with epitaxial and textured ferromagnetic layers

    DOEpatents

    Chang, Y. Austin; Yang, Jianhua Joshua

    2008-11-11

    This invention relates to magnetic tunnel junctions and methods for making the magnetic tunnel junctions. The magnetic tunnel junctions include a tunnel barrier oxide layer sandwiched between two ferromagnetic layers both of which are epitaxial or textured with respect to the underlying substrate upon which the magnetic tunnel junctions are grown. The magnetic tunnel junctions provide improved magnetic properties, sharper interfaces and few defects.

  16. Epitaxially grown polycrystalline silicon thin-film solar cells on solid-phase crystallised seed layers

    NASA Astrophysics Data System (ADS)

    Li, Wei; Varlamov, Sergey; Xue, Chaowei

    2014-09-01

    This paper presents the fabrication of poly-Si thin film solar cells on glass substrates using seed layer approach. The solid-phase crystallised P-doped seed layer is not only used as the crystalline template for the epitaxial growth but also as the emitter for the solar cell structure. This paper investigates two important factors, surface cleaning and intragrain defects elimination for the seed layer, which can greatly influence the epitaxial grown solar cell performance. Shorter incubation and crystallisation time is observed using a simplified RCA cleaning than the other two wet chemical cleaning methods, indicating a cleaner seed layer surface is achieved. Cross sectional transmission microscope images confirm a crystallographic transferal of information from the simplified RCA cleaned seed layer into the epi-layer. RTA for the SPC seed layer can effectively eliminate the intragrain defects in the seed layer and improve structural quality of both of the seed layer and the epi-layer. Consequently, epitaxial grown poly-Si solar cell on the RTA treated seed layer shows better solar cell efficiency, Voc and Jsc than the one on the seed layer without RTA treatment.

  17. 4H-SiC epitaxial layer growth by trichlorosilane (TCS)

    NASA Astrophysics Data System (ADS)

    La Via, F.; Izzo, G.; Mauceri, M.; Pistone, G.; Condorelli, G.; Perdicaro, L.; Abbondanza, G.; Calcagno, L.; Foti, G.; Crippa, D.

    2008-12-01

    The growth rate of 4H-SiC epilayers has been increased up to 100 μm/h with the use of trichlorosilane instead of silane as the silicon precursor. The epitaxial layers grown with this process have been characterized by electrical, optical and structural characterization methods. Schottky diodes, manufactured on the epitaxial layer grown with trichlorosilane at 1600 °C, have higher yield and lower defect density in comparison to diodes realized on epilayers grown with the standard epitaxial process. Both very low (<10 13/cm 3) and very high (˜10 19/cm 3) doping levels have been reached with this process. The interface between very high and low doped regions is on the order of 30-50 nm. Very thick (>100 μm) epitaxial layer has been grown and the Schottky diodes realized on these layers with a good yield (>87%). This process gives the opportunity to realize very high-power devices with breakdown voltages in the range of 10 kV with a low cost SiC epitaxy process.

  18. Thermodynamic analysis of the concentration profiles of epitaxial layers of nonideal solid solutions

    SciTech Connect

    Kazakov, A.I.; Kishmar, I.N.; Mokritskii, V.A.; Yakubovskii, M.V.

    1988-03-01

    Based on thermodynamic analysis employing the quasiregular approach a mathematical model of the process of equilibrium crystallization of nonideal three-component solid solutions of compounds of the type A/sup III/B/sup V/ from a restricted volume of a solution in a melt was constructed. This model enables calculation of the distribution of the components over the thickness of the epitaxial layer for low rates of cooling of the solution in a melt. The computer calculations of the concentration profiles of the epitaxial layers of Ga/sub 1-x/Al/sub x/ agreed well with the experimental data for thicknesses of the epitaxial layers up to 20 ..mu..m. For high rates of cooling the mass transfer in the volume of the solution in a melt must be taken into account.

  19. Magnetite epitaxial growth on Ag(001): Selected orientation, seed layer, and interface sharpness

    NASA Astrophysics Data System (ADS)

    Lamirand, A. D.; Grenier, S.; Langlais, V.; Ramos, A. Y.; Tolentino, H. C. N.; Torrelles, X.; De Santis, M.

    2016-05-01

    Epitaxial iron oxide layers with different orientations were grown on Ag(001) surface by choosing the appropriate preparation conditions. A film with a hexagonal surface mesh interpreted as (111)-oriented magnetite was formed by reactive deposition of iron in molecular oxygen at room temperature (RT), followed by annealing in UHV. Instead, highly ordered epitaxial layers with P4m symmetry were obtained by a three-step process, optimized through in situ experiments. Following this method, an ultrathin Fe layer was first grown in coherent epitaxy on the substrate and then dosed twice with O2, first at RT and next during annealing. A structural analysis combining low-energy electron diffraction, scanning tunneling microscopy, and accurate surface x-ray diffraction measurements confirmed that these films consist of (001)-oriented magnetite, although with a slight tetragonal distortion induced by the substrate constraints. Both its surface and interface are atomically sharp, an essential requirement for its integration into spintronic based devices.

  20. Carrier Transport in Epitaxial Multi-layer Graphene

    NASA Astrophysics Data System (ADS)

    Lin, Yu-Ming; Dimitrakopoulos, Christos; Farmer, Damon; Han, Shu-Jen; Wu, Yanqing; Zhu, Wenjuan; Gaskill, D. Kurt; Tedesco, Joseph; Myers-Ward, Rachael; Eddy, Charles, Jr.; Grill, Alfred; Avouris, Phaedon; Ibm Team; Nrl Team

    2011-03-01

    Significant attention has been focused recently on the electrical properties of graphene grown epitaxially on SiC substrates, because it offers an ideal platform for carbon-based electronics using conventional top-down lithography techniques. The transport properties of graphene are usually studied via Hall effect measurements, which provide information on the carrier mobility and density. Hall measurements performed at a single magnetic field yield a weighted average of carrier mobility and density, and are strictly applicable to homogeneous samples. In this study, we performed variable-field Hall and resistivity measurements on epitaxial graphene, and the results were analyzed with a multi-carrier model. Good agreements were obtained between experimental data and the model, providing further evidence of multi-carrier transport in the C-face grown MLG. This work is supported by DARPA under contract FA8650-08-C-7838 through the CERA program and by the Office of Naval Research.

  1. Ferroelectric Pb(Zr,Ti)O{sub 3} epitaxial layers on GaAs

    SciTech Connect

    Louahadj, L.; Le Bourdais, D.; Agnus, G.; Pillard, V.; Lecoeur, P.; Largeau, L.; Mazet, L.; Bachelet, R.; Regreny, P.; Dubourdieu, C.; Gautier, B.; Saint-Girons, G.; Albertini, D.

    2013-11-18

    Ferroelectric epitaxial Pb(Zr,Ti)O{sub 3} (PZT) layers were grown by pulsed laser deposition on SrTiO{sub 3}/GaAs templates fabricated by molecular beam epitaxy. The templates present an excellent structural quality and the SrTiO{sub 3}/GaAs is abrupt at the atomic scale. The PZT layers contain a- and c-domains, as shown by X-Ray diffraction analyses. Piezoforce microscopy experiments and macroscopic electrical characterizations indicate that PZT is ferroelectric. A relative dielectric permittivity of 164 is extracted from these measurements.

  2. InGaN light emitting diodes with a nanopipe layer formed from the GaN epitaxial layer.

    PubMed

    Hsu, Wei-Ju; Chen, Kuei-Ting; Huang, Wan-Chun; Wu, Chia-Jung; Dai, Jing-Jie; Chen, Sy-Hann; Lin, Chia-Feng

    2016-05-30

    A Si-heavy doped GaN:Si epitaxial layer is transformed into a directional nanopipe GaN layer through a laser-scribing process and a selectively electrochemical (EC) etching process. InGaN light-emitting diodes (LEDs) with an EC-treated nanopipe GaN layer have a high light extraction efficiency. The direction of the nanopipe structure was directed perpendicular to the laser scribing line and was guided by an external bias electric field. An InGaN LED structure with an embedded nanopipe GaN layer can enhance external quantum efficiency through a one-step epitaxial growth process and a selective EC etching process. A birefringence optical property and a low effective refractive index were observed in the directional-nanopipe GaN layer. PMID:27410087

  3. Electronic structure of epitaxial graphene layers on SiC: effects of the substrate

    SciTech Connect

    Varchon, F.; Feng, R.; Hass, J.; Li, X.; Nguyen, B. Ngoc; Naud, C.; Mallet, P.; Veuillen, J.-Y.; Berger, C.; Conrad, E.H.; Magaud, L.

    2008-10-17

    A strong substrate-graphite bond is found in the first all-carbon layer by density functional theory calculations and x-ray diffraction for few graphene layers grown epitaxially on SiC. This first layer is devoid of graphene electronic properties and acts as a buffer layer. The graphene nature of the film is recovered by the second carbon layer grown on both the (0001) and (0001{sup -}) 4H-SiC surfaces. We also present evidence of a charge transfer that depends on the interface geometry. Hence the graphene is doped and a gap opens at the Dirac point after three Bernal stacked carbon layers are formed.

  4. Assessment of crystal quality and unit cell orientation in epitaxial Cu₂ZnSnSe₄ layers using polarized Raman scattering.

    PubMed

    Krämmer, Christoph; Lang, Mario; Redinger, Alex; Sachs, Johannes; Gao, Chao; Kalt, Heinz; Siebentritt, Susanne; Hetterich, Michael

    2014-11-17

    We use polarization-resolved Raman spectroscopy to assess the crystal quality of epitaxial kesterite layers. It is demonstrated for the example of epitaxial Cu₂ZnSnSe₄ layers on GaAs(001) that "standing" and "lying" kesterite unit cell orientations (c'-axis parallel / perpendicular to the growth direction) can be distinguished by the application of Raman tensor analysis. From the appearance of characteristic intensity oscillations when the sample is rotated one can distinguish polycrystalline and epitaxial layers. The method can be transferred to kesterite layers oriented in any crystal direction and can shed light on the growth of such layers in general. PMID:25402065

  5. Growth and characterization of molecular beam epitaxial GaAs layers on porous silicon

    NASA Technical Reports Server (NTRS)

    Lin, T. L.; Liu, J. K.; Sadwick, L.; Wang, K. L.; Kao, Y. C.

    1987-01-01

    GaAs layers have been grown on porous silicon (PS) substrates with good crystallinity by molecular beam epitaxy. In spite of the surface irregularity of PS substrates, no surface morphology deterioration was observed on epitaxial GaAs overlayers. A 10-percent Rutherford backscattering spectroscopy minimum channeling yield for GaAs-on-PS layers as compared to 16 percent for GaAs-on-Si layers grown under the same condition indicates a possible improvement of crystallinity when GaAs is grown on PS. Transmission electron microscopy reveals that the dominant defects in the GaAs-on-PS layers are microtwins and stacking faults, which originate from the GaAs/PS interface. GaAs is found to penetrate into the PS layers. n-type GaAs/p-type PS heterojunction diodes were fabricated with good rectifying characteristics.

  6. Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization

    SciTech Connect

    Kraus, Theodore J.; Nepomnyashchii, Alexander B.; Parkinson, B. A.

    2015-01-15

    Atomic layer deposition was used to grow epitaxial layers of anatase (001) TiO{sub 2} on the surface of SrTiO{sub 3} (100) crystals with a 3% lattice mismatch. The epilayers grow as anatase (001) as confirmed by x-ray diffraction. Atomic force microscope images of deposited films showed epitaxial layer-by-layer growth up to about 10 nm, whereas thicker films, of up to 32 nm, revealed the formation of 2–5 nm anatase nanocrystallites oriented in the (001) direction. The anatase epilayers were used as substrates for dye sensitization. The as received strontium titanate crystal was not sensitized with a ruthenium-based dye (N3) or a thiacyanine dye (G15); however, photocurrent from excited state electron injection from these dyes was observed when adsorbed on the anatase epilayers. These results show that highly ordered anatase surfaces can be grown on an easily obtained substrate crystal.

  7. Gallium Arsenide Layers Grown by Molecular Beam Epitaxy on Single Crystalline Germanium Islands on Insulator

    NASA Astrophysics Data System (ADS)

    Takai, Mikio; Tanigawa, Takaho; Minamisono, Tadanori; Gamo, Kenji; Namba, Susumu

    1984-05-01

    Gallium arsenide (GaAs) layers have successfully been grown by molecular beam epitaxy on single crystalline germanium (Ge) islands, recrystallized by zone melting with SiO2 capping layers, on thermally-oxidized Si-wafers. The GaAs layers, grown on the single crystalline Ge islands, show smooth surfaces without any grain-boundaries, while those, grown on the Ge islands with grain-boundaries and on the SiO2, have grain-boundaries. The GaAs layers on the single crystalline Ge islands emit photoluminescence, the intensity of which is almost comparable to that of GaAs layers on bulk Ge crystals.

  8. Formation of Organic Thin Films of Nonlinear Optical Materials by Molecular Layer Epitaxy

    NASA Astrophysics Data System (ADS)

    Burtman, V.; Kopylova, T. N.; Van Der Boom, M.; Gadirov, R. M.; Tel'minov, E. N.; Nikonov, S. Yu.; Nikonova, E. N.

    2016-03-01

    Conditions are described under which films of [(aminophenyl)azo]pyridine are formed by molecular layer epitaxy, and their optical absorption and x-ray photoelectron spectra are investigated. The nonlinear properties of such structures are described with the help of measurements of the intensity of second harmonic generation as a function of the angle of incidence.

  9. Electronic structures of single- and multi-layer epitaxial graphene on SiC (0001)

    NASA Astrophysics Data System (ADS)

    Kim, Seungchul; Ihm, Jisoon; Son, Young-Woo

    2009-03-01

    The electronic structures of single- and multi-layered epitaxial graphene on silicon carbide (0001) surface are studied theoretically. To calculate energy bands of the systems, we construct the simple Hamiltonian with tight-binding approximations. We confirm that the present simple model do give identical electronic structure to the previous ab-initio study on the single layer case [1]. We extend the model up to four epitaxial graphene layers to explain various interesting experimental findings. The roles of the coupling between graphenes and the buffer layer, and their large scale reconstructions to the electronic structures are also investigated. [1] S. Kim, J. Ihm, H. J. Choi, Y.-W. Son, Phys. Rev. Lett. 100, 176802 (2008).

  10. Low-temperature growth of silicon epitaxial layers codoped with erbium and oxygen atoms

    SciTech Connect

    Shengurov, D. V.; Chalkov, V. Yu.; Denisov, S. A.; Shengurov, V. G.; Stepikhova, M. V.; Drozdov, M. N.; Krasilnik, Z. F.

    2013-03-15

    The fabrication technology and properties of light-emitting Si structures codoped with erbium and oxygen are reported. The layers are deposited onto (100) Si by molecular beam epitaxy (MBE) using an Er-doped silicon sublimation source. The partial pressure of the oxygen-containing gases in the growth chamber of the MBE facility before layer growth is lower than 5 Multiplication-Sign 10{sup -10} Torr. The oxygen and erbium concentrations in the Si layers grown at 450 Degree-Sign C is {approx}1 Multiplication-Sign 10{sup 19} and 10{sup 18} cm{sup -3}, respectively. The silicon epitaxial layers codoped with erbium and oxygen have high crystal quality and yield effective photoluminescence and electroluminescence signals with the dominant optically active Er-1 center forming upon postgrowth annealing at a temperature of 800 Degree-Sign C.

  11. Atomic layer epitaxy of hematite on indium tin oxide for application in solar energy conversion

    DOEpatents

    Martinson, Alex B.; Riha, Shannon; Guo, Peijun; Emery, Jonathan D.

    2016-07-12

    A method to provide an article of manufacture of iron oxide on indium tin oxide for solar energy conversion. An atomic layer epitaxy method is used to deposit an uncommon bixbytite-phase iron (III) oxide (.beta.-Fe.sub.2O.sub.3) which is deposited at low temperatures to provide 99% phase pure .beta.-Fe.sub.2O.sub.3 thin films on indium tin oxide. Subsequent annealing produces pure .alpha.-Fe.sub.2O.sub.3 with well-defined epitaxy via a topotactic transition. These highly crystalline films in the ultra thin film limit enable high efficiency photoelectrochemical chemical water splitting.

  12. Atomic layer epitaxy of AlAs and AlGaAs

    NASA Astrophysics Data System (ADS)

    Meguro, T.; Iwai, S.; Aoyagi, Y.; Ozaki, K.; Yamamoto, Y.; Suzuki, T.; Okano, Y.; Hirata, A.

    1990-01-01

    Atomic layer epitaxy (ALE) of AlAs and AlGaAs with metalorganic vapor-phase epitaxy (MOVPE) under Ar-ion laser irradiation has been successfully realized in a triethylaluminum (TEA)/AsH 3 system for the first time. Comparison with the growth characteristics of MOVPE with alternative feeding modes of TMA/AsH 3 and TEA/AsH 3 is discussed. Application to laser-ALE of AlGaAs using a triethylgallium (TEG)/TEA/AsH 3 system is also discussed.

  13. Origin and reduction of impurities at GaAs epitaxial layer-substrate interfaces

    NASA Astrophysics Data System (ADS)

    Kanber, H.; Yang, H. T.; Zielinski, T.; Whelan, J. M.

    1988-09-01

    Surface cleaning techniques used for semi-insulating GaAs substrates prior to epitaxial growth can have an important and sometimes detrimental effect on the quality and characteristics of epitaxial layers that are grown on them. We observe that a HF rinse followed by a 5:1:1 H 2SO 4:H 2O 2:H 2O etch and H 2O rinse drastically reduced the maximum concentrations and total amount of both SIMS detected S and Si for MOCVD grown GaAs undoped epitaxial layers. Subsequent final HCl and H 2O reduced the S interfacial residues to the SIMS detection limit. Total amounts of residual Si are estimated to be equivalent to 10 -2 to 10 -3 monolayers. Residual S is less. Alternately the S residue can be comparable reduced by a HF rinse followed by a NH 4OH:H 2O 2:H 2O etch and H 2O rinse. Hot aqueous HCl removes S but not Si residues. The Si residue is not electrically active and most likely exists as islands of SiO 2. The relative significance of the impurity residues is most pronounced for halide VPE, smaller for MBE and least for MOCVD grown GaAs epitaxial layers.

  14. Investigation of epitaxial silicon layers as a material for radiation hardened silicon detectors

    SciTech Connect

    Li, Z.; Eremin, V.; Ilyashenko, I.; Ivanov, A.; Verbitskaya, E.; CERN RD-48 ROSE Collaboration

    1997-12-01

    Epitaxial grown thick layers ({ge} 100 micrometers) of high resistivity silicon (Epi-Si) have been investigated as a possible candidate of radiation hardened material for detectors for high-energy physics. As grown Epi-Si layers contain high concentration (up to 2 {times} 10{sup 12} cm{sup {minus}3}) of deep levels compared with that in standard high resistivity bulk Si. After irradiation of test diodes by protons (E{sub p} = 24 GeV) with a fluence of 1.5 {times} 10{sup 11} cm{sup {minus}2}, no additional radiation induced deep traps have been detected. A reasonable explanation is that there is a sink of primary radiation induced defects (interstitial and vacancies), possibly by as-grown defects, in epitaxial layers. The ``sinking`` process, however, becomes non-effective at high radiation fluences (10{sup 14} cm{sup {minus}2}) due to saturation of epitaxial defects by high concentration of radiation induced ones. As a result, at neutron fluence of 1 {times} 10{sup 14} cm{sup {minus}2} the deep level spectrum corresponds to well-known spectrum of radiation induced defects in high resistivity bulk Si. The net effective concentration in the space charge region equals to 3 {times} 10{sup 12} cm{sup {minus}3} after 3 months of room temperature storage and reveals similar annealing behavior for epitaxial as compared to bulk silicon.

  15. Investigation of epitaxial silicon layers as a material for radiation hardened silicon detectors

    SciTech Connect

    Li, Z.; Eremin, V.; Ilyashenko, I.; Ivanov, A.

    1997-11-01

    Epitaxial grown thick layers (>100 {mu}m) of high resistivity silicon (Epi-Si) have been investigated as a possible candidate of radiation hardened material for detectors for high-energy physics. As grown Epi-Si layers contain high concentration (up to 2{center_dot}10{sup 12} cm{sup {minus}3}) of deep levels compared with that in standard high resistivity bulk Si. After irradiation of test diodes by protons (E{sub p} = 24 GeV) with a fluence of 1.5{center_dot}10{sup 11} cm{sup {minus}2}, no additional radiation induced deep traps have been detected. A reasonable explanation is that there is a sink of primary radiation induced defects, in epitaxial layers. The {open_quotes}sinking{close_quotes} process, however, becomes non-effective at high radiation fluences (10{sup 14} cm{sup {minus}2}) due to saturation of epitaxial defects by high concentration of radiation induced ones. As a result, at neutron fluence of 1{center_dot}10{sup 14}cm{sup {minus}2} the deep level spectrum corresponds to well-known spectrum of radiation induced defects in high resistivity bulk Si. The net effective concentration in the space charge region equals to 3{center_dot}10{sup 12} cm{sup {minus}3} after 3 months of room temperature storage and reveals similar annealing behavior for epitaxial as compared to bulk silicon.

  16. Defect formation in epitaxial layers of doped with cd and sn

    SciTech Connect

    Arbenina, V.V.; Skakovskii, S.I.; Voloshin, A.E.

    1986-10-01

    The authors consider the dislocation structure and impurity-atom distributions in GaSb epitaxial layers doped with Cd and Sn and grown by liquid-phase epitaxy (LPE) on undoped gallium antimonide substrates. A horizontal apparatus was used to carry out epitaxy. The samples were investigated by x-ray topography and double-crystal spectroscopy. The concentration and mobility of the charge carriers were determined by Hall-effect measurements using the Van der Pauw method. It is shown that in the case of double doping of gallium antimonide by cadmium and tin the dislocation density may decrease by an order of magnitude compared to values obtained when these impurities are individually added. A possible distribution mechanism of Cd and Sn atoms in the GaSb lattice is presented.

  17. Characterization and growth of epitaxial layers of Gs exhibiting high resistivity for ionic implantation

    NASA Technical Reports Server (NTRS)

    1979-01-01

    Either classical or low temperature epitaxial growth techniques can be used to control the deposition of buffer layers of GaAs on semiconducting substrates and to obtain the resistivity and purity desired. Techniques developed to study, as a function of thickness, the evolution of mobilities by photoHall, and the spectroscopy of shallow and deep centers by cathodoluminescence and current transients reveal one very pure layer of medium resistivity and high mobility, and another "dead layer" of elevated resistivity far from the surface. The highly resistive layer remains pure over several microns, which appears interesting for implantation.

  18. The growth of an epitaxial Mg Al spinel layer on sapphire by solid-state reactions

    NASA Astrophysics Data System (ADS)

    Liu, Che-Ming; Chen, Jyh-Chen; Chen, Chun-Jen

    2005-11-01

    In this work an epitaxial Mg-Al spinel layer was successfully grown on a sapphire single crystal surface by solid-state reactions. An Mg film (15 μm) was sputtered onto the sapphire crystal using RF magnetron sputtering. An epitaxial Mg-Al spinel layer was formed on the sapphire surface; an MgO layer was formed on top of the spinel layer by solid-state reactions that occurred around 1300-1600 °C, in an air atmosphere. When the reaction time was lengthened to over 30 h at 1600 °C, these layers were almost completely transformed into an epitaxial Mg-Al spinel layer. The thickness of the epitaxial layer could be controlled by the length of the reaction time and the temperature. The results of X-ray diffraction analysis indicate that the orientation of the MgO and the spinel growth was dependent on the plane of the sapphire, that is (0 0 0 1) sapphire||(1 1 1) spinel||(1 1 1) MgO and (1 1 2¯ 0) sapphire||(1 1 1) spinel||(1 1 1) MgO. It was confirmed that the in-plane orientation of the spinel with respect to the C- and A-sapphire surface was [1 1¯ 0 0] sapphire||[1¯ 1 0] spinel, [1 1 2¯ 0] sapphire||[1¯ 1¯ 2] spinel and [1 0 1¯ 0] sapphire||[1¯ 1 0] spinel, [0 0 0 1] sapphire||[1¯ 1¯ 2] spinel, and there would be (1¯ 1 0)-oriented spinel growth on the M-plane sapphire substrate.

  19. Electronic and material characterization of silicon-germanium and silicon-germanium-carbon epitaxial layers

    NASA Astrophysics Data System (ADS)

    Peterson, Jeffrey John

    This dissertation presents results of material and electronic characterization of strained SiGe and SiGeC epitaxial layers grown on (100) silicon using Atmospheric Pressure Chemical Vapor Deposition and Reduced Pressure Chemical Vapor Deposition. Fabrication techniques for SiGe and SiGeC are also presented. Materials characterization of epitaxial SiGe and SiGeC was done to characterize crystallinity using visual, microscopic, and Rutherford Backscattering (RBS) characterization. Surface roughness was characterized and found to correspond roughly with epitaxial crystal quality. Spectroscopic ellipsometry was used to study epitaxial layer composition and thickness, requiring development of models for nSiGe and nSiGeC versus composition (the first published for nSiGeC) and generation of ellipsometric nomograms. X-ray diffraction (XRD) measurements of epitaxial strain and relaxation showed Ge composition dominates the stress, although strain compensation due to C was observed. XRD, Raman, and Fourier Transform Infrared (FTIR) characterization were done to characterize substitutional C in SiGeC epitaxial layers, finding that C incorporation into SiGeC saturates for C contents >1%. Fabrication techniques for SiGe and SiGeC were examined. Low thermal budget processing of strained layers were investigated as well as fabrication techniques using advantageous material properties of SiGe and SiGeC. Ti/Al contacts were developed and characterized for electrical contact to SiGe and SiGeC. Schottky contacts of Pt silicide on SiGe and SiGeC was done; formation and resistivity were characterized. Four separate resistivity characterization structures have been fabricated using mesa-etch and Si etch-stop techniques. A NPN Heterojunction Bipolar transistor has been fabricated using successive mesa-etches and SiGe (or SiGeC) etch-stops. Electronic characterization of in-situ doped SiGe and SiGeC epitaxial layers was done to determine resistivity, mobility, and bandgap. Resistivities

  20. Current isolating epitaxial buffer layers for high voltage photodiode array

    DOEpatents

    Morse, Jeffrey D.; Cooper, Gregory A.

    2002-01-01

    An array of photodiodes in series on a common semi-insulating substrate has a non-conductive buffer layer between the photodiodes and the semi-insulating substrate. The buffer layer reduces current injection leakage between the photodiodes of the array and allows optical energy to be converted to high voltage electrical energy.

  1. Lattice-matched HfN buffer layers for epitaxy of GaN on Si

    SciTech Connect

    Armitage, Robert; Yang, Qing; Feick, Henning; Gebauer, Joerg; Weber, Eicke R.; Shinkai, Satoko; Sasaki, Katsutaka

    2002-05-08

    Gallium nitride is grown by plasma-assisted molecular-beam epitaxy on (111) and (001) silicon substrates using sputter-deposited hafnium nitride buffer layers. Wurtzite GaN epitaxial layers are obtained on both the (111) and (001) HfN/Si surfaces, with crack-free thickness up to 1.2 (mu)m. Initial results for GaN grown on the (111) surface show a photoluminescence peak width of 17 meV at 11 K, and an asymmetric x-ray rocking curve width of 20 arcmin. Wurtzite GaN on HfN/Si(001) shows reduced structural quality and peculiar low-temperature luminescence features. However, growth on the (001) surface results in nearly stress-free films, suggesting that much thicker crack-free layers could be obtained.

  2. Defect formation and carrier doping in epitaxial films of the infinite layer compound

    SciTech Connect

    Feenstra, R.; Pennycook, S.J.; Chisholm, M.F.

    1996-02-01

    The correlation between defect formation and carrier doping in epitaxial films of the infinite layer compound SrCuO{sub 2} has been studied via molecular beam epitaxy controlled layer-by-layer growth experiments, chemically resolved scanning transmission electron microscopy, scanning tunneling microscopy, x-ray diffraction, electrical transport measurements, and post-growth oxidation-reduction annealing. Based on the complementary information provided by these experiments, it is concluded that the carrier doping is dominated by the formation of an electron-doped, Sr and O deficient matrix under mildly oxidizing growth conditions. Hole-doping is induced by extended defects containing excess Sr atoms and may lead to superconductivity after high-temperature oxidation.

  3. High mobility Single Layer Epitaxial Graphene on 4H-SiC (000-1)

    NASA Astrophysics Data System (ADS)

    Hu, Yike; Guo, Zelei; Ruan, Ming; Hankinson, John; Palmer, James; Zhang, Baiqian; Dong, Rui; Kunc, Jan; Berger, Claire; Deheer, Walt

    2012-02-01

    Multi-layer Epitaxial Graphene on 4H-SiC (000-1) has demonstrated very high mobility up to˜27,000 cm^2/Vs [1]. Recently single layer graphene grown by the Confinement Control Growth method [2] exhibits mobility up to ˜ 25,000cm^2/V.s at 4K and 13,000 cm^2/V.s at 300K with p=3 x 10^12 cm-2 The relation between Raman G peak features (FWHM and position) and carrier density of Epitaxial Graphene on carbon face is revealed. Quantum Hall Effect [3] is observed both for p and n type carriers on top gated sample. This indicates that top gated single layer graphene can be produced on the Carbon face with high quality and high carrier mobility. [4pt] [1] Science 312, 1191 (2006) [0pt] [2] PNAS 108 (41) 16900 (2011) [0pt] [3] APL 95, 223108 (2009)

  4. Photoluminescence of Si-doped GaAs epitaxial layers

    SciTech Connect

    Yaremenko, N. G. Karachevtseva, M. V.; Strakhov, V. A.; Galiev, G. B.; Mokerov, V. G.

    2008-12-15

    The effect of arsenic pressure on the amphoteric behavior of Si during the growth of the Si-doped (100)-, (111)Ga-, and (111)As-oriented GaAs layers is studied by photoluminescence spectroscopy. The edge luminescence band is examined, and the concentration and the degree of compensation as functions of the arsenic pressure are determined. Nonstoichiometry defects in GaAs layers grown with a deficit and an excess of arsenic are studied. It is shown that the defects formed in the (111)Ga- and (111)As-oriented layers are different in nature.

  5. GaAs/Si epitaxial integration utilizing a two-step, selectively grown Ge intermediate layer

    NASA Astrophysics Data System (ADS)

    Cederberg, Jeffrey G.; Leonhardt, Darin; Sheng, Josephine J.; Li, Qiming; Carroll, Malcolm S.; Han, Sang M.

    2010-04-01

    We describe efforts to epitaxially integrate GaAs with Si, using thin, relaxed Ge layers. The Ge films are deposited by molecular beam epitaxy using a self-assembled, selective-area growth technique, where atomic Ge etches an SiO 2 mask layer and then grows from pores extending to the Si substrate. The resulting Ge film coalesces over the SiO 2 mask and is planarized, using H 2O 2-based chemical-mechanical polishing. We subsequently deposit a GaAs/AlAs heterostructure on the polished Ge on Si substrate by metal-organic vapor phase epitaxy. While the initial Ge films were completely relaxed and dislocation-free, they contain a high density of stacking faults that propagate through the GaAs/AlAs heterostructure. These stacking faults create phase domains that appear as non-radiative recombination centers in cathodoluminescence images. Further development of two-step Ge epitaxy with an anneal near the Ge melting point eliminates stacking faults in the Ge, but decomposes the SiO 2 mask allowing threading dislocations to form and propagate through the GaAs/AlAs heterostructure. We discuss our strategy to prevent the loss of the SiO 2 mask and thus reduce threading dislocations.

  6. Integration of GaAs epitaxial layer to Si-based substrate using Ge condensation and low-temperature migration enhanced epitaxy techniques

    SciTech Connect

    Oh, Hoon Jung; Choi, Kyu Jin; Loh, Wei Yip; Htoo, Thwin; Chua, Soo Jin; Cho, Byung Jin

    2007-09-01

    A GaAs defect-free epitaxial layer has been grown on Si via a Ge concentration graded SiGe on insulator (SGOI) for application in high channel-mobility metal-oxide-semiconductor field effect transistor. The SGOI layer, 42 nm thick, serves as the compliant and intermediate buffer to reduce the lattice and thermal expansion mismatches between Si and GaAs. A modified two-step Ge condensation technique achieves the surface Ge concentration in SGOI as high as 71%. It is also found that low-temperature migration enhanced epitaxy during the initial GaAs nucleation on the SGOI surface is critical to obtain a device quality GaAs layer by epitaxial growth.

  7. Surface photovoltage method for the quality control of silicon epitaxial layers on sapphire

    SciTech Connect

    Yaremchuk, A. F.; Starkov, A. V.; Zaikin, A. V.; Alekseev, A. V.; Sokolov, E. M.

    2014-12-15

    The surface photovoltage method is used to study “silicon-on-sapphire” epitaxial layers with a thickness of 0.3–0.6 μm, which are used to fabricate p-channel MOS (metal—oxide-semiconductor) transistors with improved radiation hardness. It is shown that the manner in which the photoconductivity of the epitaxial layer decays after the end of a light pulse generated by a light-emitting diode (wavelength ∼400 nm) strongly depends on the density of structural defects in the bulk of the structure. This enables control over how a “silicon-on-sapphire” structure is formed to provide the manufacturing of MOS structures with optimal operating characteristics.

  8. A novel, layered phase in Ti-rich SrTiO3 epitaxial thin films.

    PubMed

    Lee, Sungki; Damodaran, Anoop R; Gorai, Prashun; Oh, Nuri; Moyer, Jarrett A; Kwon, Ji-Hwan; Ferdous, Naheed; Shah, Amish; Chen, Zuhuang; Breckenfeld, Eric; Mangalam, R V K; Braun, Paul V; Schiffer, Peter; Shim, Moonsub; Zuo, Jian-Min; Ertekin, Elif; Martin, Lane W

    2015-02-01

    Sr2Ti7O14, a new phase, is synthesized by leveraging the innate chemical and thermo-dynamic instabilities in the SrTiO3-TiO2 system and non-equilibrium growth techniques. The chemical composition, epitaxial relationships, and orientation play roles in the formation of this novel layered phase, which, in turn, possesses unusual charge ordering, anti-ferromagnetic ordering, and low, glass-like thermal conductivity. PMID:25523179

  9. Surface morphological evolution during annealing of epitaxial Cu(001) layers

    SciTech Connect

    Purswani, J. M.; Gall, D.

    2008-08-15

    Single crystal Cu(001) layers were grown on MgO(001) by ultrahigh vacuum magnetron sputtering at T{sub s}=100 deg. C. Quantitative surface morphological analyses by in situ scanning tunneling microscopy show that the surfaces exhibit self-affine mound structures with a scaling exponent of 0.82{+-}0.03 and a mound radius r{sub c} that increases from 31{+-}8 to 39{+-}6 nm for increasing layer thickness t=24-120 nm. In situ annealing at 200 and 300 deg. C leads to a thermodynamically driven mass transport that minimizes the surface step density, resulting in broader mounds and a smaller root mean square surface roughness {sigma}. This effect is most pronounced for t=24 nm, for which r{sub c} increases from 31{+-}8 to 70{+-}20 nm and {sigma} decreases from 1.3{+-}0.1 to 0.74{+-}0.08 nm, resulting in a decrease in the average surface slope from {chi}=7 deg. to 2 deg. and an increase in the average terrace width w{sub T} by more than a factor of 4. In contrast, w{sub T} increases by only 20% for t=120 nm. This remarkable difference between 'thin' and 'thick' layers is attributed to diverging surface morphological pathways during annealing: The strong smoothening for t=24 nm is due to a competitive coalescence process where some mounds grow laterally at the expense of their smaller neighbors, which die out. In contrast, the initially wider mounds of thicker layers (t=120 nm) combine to form a quasistable surface morphology that exhibits anisotropic mound structures, which limit mass transport and stabilize the surface step density.

  10. Pump-probe surface photovoltage spectroscopy measurements on semiconductor epitaxial layers

    SciTech Connect

    Jana, Dipankar Porwal, S.; Sharma, T. K. Oak, S. M.; Kumar, Shailendra

    2014-04-15

    Pump-probe Surface Photovoltage Spectroscopy (SPS) measurements are performed on semiconductor epitaxial layers. Here, an additional sub-bandgap cw pump laser beam is used in a conventional chopped light geometry SPS setup under the pump-probe configuration. The main role of pump laser beam is to saturate the sub-bandgap localized states whose contribution otherwise swamp the information related to the bandgap of material. It also affects the magnitude of Dember voltage in case of semi-insulating (SI) semiconductor substrates. Pump-probe SPS technique enables an accurate determination of the bandgap of semiconductor epitaxial layers even under the strong influence of localized sub-bandgap states. The pump beam is found to be very effective in suppressing the effect of surface/interface and bulk trap states. The overall magnitude of SPV signal is decided by the dependence of charge separation mechanisms on the intensity of the pump beam. On the contrary, an above bandgap cw pump laser can be used to distinguish the signatures of sub-bandgap states by suppressing the band edge related feature. Usefulness of the pump-probe SPS technique is established by unambiguously determining the bandgap of p-GaAs epitaxial layers grown on SI-GaAs substrates, SI-InP wafers, and p-GaN epilayers grown on Sapphire substrates.

  11. Pump-probe surface photovoltage spectroscopy measurements on semiconductor epitaxial layers

    NASA Astrophysics Data System (ADS)

    Jana, Dipankar; Porwal, S.; Sharma, T. K.; Kumar, Shailendra; Oak, S. M.

    2014-04-01

    Pump-probe Surface Photovoltage Spectroscopy (SPS) measurements are performed on semiconductor epitaxial layers. Here, an additional sub-bandgap cw pump laser beam is used in a conventional chopped light geometry SPS setup under the pump-probe configuration. The main role of pump laser beam is to saturate the sub-bandgap localized states whose contribution otherwise swamp the information related to the bandgap of material. It also affects the magnitude of Dember voltage in case of semi-insulating (SI) semiconductor substrates. Pump-probe SPS technique enables an accurate determination of the bandgap of semiconductor epitaxial layers even under the strong influence of localized sub-bandgap states. The pump beam is found to be very effective in suppressing the effect of surface/interface and bulk trap states. The overall magnitude of SPV signal is decided by the dependence of charge separation mechanisms on the intensity of the pump beam. On the contrary, an above bandgap cw pump laser can be used to distinguish the signatures of sub-bandgap states by suppressing the band edge related feature. Usefulness of the pump-probe SPS technique is established by unambiguously determining the bandgap of p-GaAs epitaxial layers grown on SI-GaAs substrates, SI-InP wafers, and p-GaN epilayers grown on Sapphire substrates.

  12. Pump-probe surface photovoltage spectroscopy measurements on semiconductor epitaxial layers.

    PubMed

    Jana, Dipankar; Porwal, S; Sharma, T K; Kumar, Shailendra; Oak, S M

    2014-04-01

    Pump-probe Surface Photovoltage Spectroscopy (SPS) measurements are performed on semiconductor epitaxial layers. Here, an additional sub-bandgap cw pump laser beam is used in a conventional chopped light geometry SPS setup under the pump-probe configuration. The main role of pump laser beam is to saturate the sub-bandgap localized states whose contribution otherwise swamp the information related to the bandgap of material. It also affects the magnitude of Dember voltage in case of semi-insulating (SI) semiconductor substrates. Pump-probe SPS technique enables an accurate determination of the bandgap of semiconductor epitaxial layers even under the strong influence of localized sub-bandgap states. The pump beam is found to be very effective in suppressing the effect of surface/interface and bulk trap states. The overall magnitude of SPV signal is decided by the dependence of charge separation mechanisms on the intensity of the pump beam. On the contrary, an above bandgap cw pump laser can be used to distinguish the signatures of sub-bandgap states by suppressing the band edge related feature. Usefulness of the pump-probe SPS technique is established by unambiguously determining the bandgap of p-GaAs epitaxial layers grown on SI-GaAs substrates, SI-InP wafers, and p-GaN epilayers grown on Sapphire substrates. PMID:24784628

  13. The energetics of dislocation array stability in strained epitaxial layers

    NASA Astrophysics Data System (ADS)

    Gosling, T. J.; Willis, J. R.; Bullough, R.; Jain, S. C.

    1993-06-01

    Two aspects of the energetics of dislocation array stability in lattice-mismatched strained layers are addressed. The first concerns criteria for determining equilibrium dislocation distributions in strained layers; the second concerns the difference between the energies of arrays of dislocations in which the Burgers vectors of all dislocations are identical, and those in which the screw components of the Burgers vectors alternate. The conclusions reached are at variance with those of recent work by Feng and Hirth on periodic arrays of dipoles in an infinite body [X. Feng and J. P. Hirth, J. Appl. Phys. 72, 1386 (1992); J. P. Hirth and X. Feng, J. Appl. Phys. 67, 3343 (1990)]. In particular, it is emphasized that if layers remain in equilibrium then there is always a residual mean strain; in other words, the mismatch strain is never completely relaxed. Also it is shown, via a direct calculation, that although alternating the screw components of the Burgers vectors of dislocations within a single array is energetically favorable, it is preferable to have all screw components of the same sign within an array if two orthogonal arrays are considered. Although for comparison with the work of Feng and Hirth arrays of dipoles in an infinite body are considered in more detail, the stated conclusions are also shown to hold for arrays of unpaired dislocations near a free surface.

  14. Lateral epitaxial growth of two-dimensional layered semiconductor heterojunctions.

    PubMed

    Duan, Xidong; Wang, Chen; Shaw, Jonathan C; Cheng, Rui; Chen, Yu; Li, Honglai; Wu, Xueping; Tang, Ying; Zhang, Qinling; Pan, Anlian; Jiang, Jianhui; Yu, Ruqing; Huang, Yu; Duan, Xiangfeng

    2014-12-01

    Two-dimensional layered semiconductors such as MoS₂ and WSe₂ have attracted considerable interest in recent times. Exploring the full potential of these layered materials requires precise spatial modulation of their chemical composition and electronic properties to create well-defined heterostructures. Here, we report the growth of compositionally modulated MoS₂-MoSe₂ and WS₂-WSe₂ lateral heterostructures by in situ modulation of the vapour-phase reactants during growth of these two-dimensional crystals. Raman and photoluminescence mapping studies demonstrate that the resulting heterostructure nanosheets exhibit clear structural and optical modulation. Transmission electron microscopy and elemental mapping studies reveal a single crystalline structure with opposite modulation of sulphur and selenium distributions across the heterostructure interface. Electrical transport studies demonstrate that the WSe₂-WS₂ heterojunctions form lateral p-n diodes and photodiodes, and can be used to create complementary inverters with high voltage gain. Our study is an important advance in the development of layered semiconductor heterostructures, an essential step towards achieving functional electronics and optoelectronics. PMID:25262331

  15. Impact of silicon epitaxial thickness layer in high power diode devices

    NASA Astrophysics Data System (ADS)

    Mee, Cheh Chai; Arshad, M. K. Md.; Hashim, U.; Fathil, M. F. M.

    2016-07-01

    The p-i-n diode is one of the earliest semiconductor devices developed for power circuit application. It is formed with the intrinsically doped i.e. i-layer sandwiched between the p-type and n-type layers. In this paper, we focus on the integration of the intrinsic region of silicon p-i-n diode to the current-voltage characteristics. In our structure, n-type refers to the bulk substrate and intrinsic region refers to the epitaxial layer of the silicon substrate. We make a thickness variation in the intrinsic region of p-i-n diode and how it affects diode performance. An additional layer is added on the epitaxial layer during the process to control the diffusion from the bottom of bulk substrate. Result shows that intrinsic layer optimization has successfully enhances the diode device robustness in terms of diode current-voltage characteristics, which reflects better manufacturing yield and improve the final product performance.

  16. Carrier Lifetime Measurement for Characterization of Ultraclean Thin p/p+ Silicon Epitaxial Layers

    NASA Astrophysics Data System (ADS)

    Elhami Khorasani, Arash

    Carrier lifetime is one of the few parameters which can give information about the low defect densities in today's semiconductors. In principle there is no lower limit to the defect density determined by lifetime measurements. No other technique can easily detect defect densities as low as 10 -9 - 10-10 cm-3 in a simple, contactless room temperature measurement. However in practice, recombination lifetime τ r measurements such as photoconductance decay (PCD) and surface photovoltage (SPV) that are widely used for characterization of bulk wafers face serious limitations when applied to thin epitaxial layers, where the layer thickness is smaller than the minority carrier diffusion length Ln. Other methods such as microwave photoconductance decay (µ-PCD), photoluminescence (PL), and frequency-dependent SPV, where the generated excess carriers are confined to the epitaxial layer width by using short excitation wavelengths, require complicated configuration and extensive surface passivation processes that make them time-consuming and not suitable for process screening purposes. Generation lifetime τg, typically measured with pulsed MOS capacitors (MOS-C) as test structures, has been shown to be an eminently suitable technique for characterization of thin epitaxial layers. It is for these reasons that the IC community, largely concerned with unipolar MOS devices, uses lifetime measurements as a "process cleanliness monitor." However when dealing with ultraclean epitaxial wafers, the classic MOS-C technique measures an effective generation lifetime τgeff which is dominated by the surface generation and hence cannot be used for screening impurity densities. I have developed a modified pulsed MOS technique for measuring generation lifetime in ultraclean thin p/p+ epitaxial layers which can be used to detect metallic impurities with densities as low as 10-10 cm-3. The widely used classic version has been shown to be unable to effectively detect such low impurity

  17. Ferromagnetism and the electronic band structure in (Ga,Mn)(Bi,As) epitaxial layers

    SciTech Connect

    Yastrubchak, O.; Sadowski, J.; Domagala, J. Z.; Andrearczyk, T.; Wosinski, T.

    2014-08-18

    Impact of Bi incorporation into (Ga,Mn)As layers on their electronic- and band-structures as well as their magnetic and structural properties has been studied. Homogenous (Ga,Mn)(Bi,As) layers of high structural perfection have been grown by the low-temperature molecular-beam epitaxy technique. Post-growth annealing treatment of the layers results in an improvement of their structural and magnetic properties and an increase in the hole concentration in the layers. The modulation photoreflectance spectroscopy results are consistent with the valence-band model of hole-mediated ferromagnetism in the layers. This material combines the properties of (Ga,Mn)As and Ga(Bi,As) ternary compounds and offers the possibility of tuning its electrical and magnetic properties by controlling the alloy composition.

  18. Ion-induced epitaxial growth of chemical vapor deposited Si layers

    NASA Astrophysics Data System (ADS)

    La Ferla, A.; Rimini, E.; Ferla, G.

    1988-02-01

    Thin layers of Si were chemical vapor deposited onto as-received <100> p-type Si wafers. The samples were subsequently implanted with 1×1015/cm2, 80 keV As. The native oxide film impedes the growth even at 800 °C, 1 h; instead irradiation with 600 keV Kr++ at 450 °C causes the epitaxial growth of the entire deposited and amorphized Si layer. The sheet resistance of these As-doped layers (130 Ω/⧠) coincides with that of samples in which the amorphous layer was obtained by As ion implantation only. The value is at least ten times lower than that of the polycrystalline layer doped with the same amount of As.

  19. Evaluation of methods for application of epitaxial layers of superconductor and buffer layers

    SciTech Connect

    1997-06-01

    The recent achievements in a number of laboratories of critical currents in excess of 1.0x10{sup 6} amp/cm{sup 2} at 77K in YBCO deposited over suitably textured buffer/substrate composites have stimulated interest in the potential applications of coated conductors at high temperatures and high magnetic fields. As of today, two different approaches for obtaining the textured substrates have been identified. These are: Los Alamos National Laboratory`s (LANL) ion-beam assisted deposition called IBAD, to obtain a highly textured yttria-stabilized zirconia (YSZ) buffer on nickel alloy strips, and Oak Ridge National Laboratory`s (ORNL) rolling assisted, bi-axial texturized substrate option called RABiTS. Similarly, based on the published literature, the available options to form High Temperature Superconductor (HTS) films on metallic, semi-metallic or ceramic substrates can be divided into: physical methods, and non-physical or chemical methods. Under these two major groups, the schemes being proposed consist of: - Sputtering - Electron-Beam Evaporation - Flash Evaporation - Molecular Beam Epitaxy - Laser Ablation - Electrophoresis - Chemical Vapor Deposition (Including Metal-Organic Chemical Vapor Deposition) - Sol-Gel - Metal-Organic Decomposition - Electrodeposition, and - Aerosol/Spray Pyrolysis. In general, a spool- to-spool or reel-to-reel type of continuous manufacturing scheme developed out of any of the above techniques, would consist of: - Preparation of Substrate Material - Preparation and Application of the Buffer Layer(s) - Preparation and Application of the HTS Material and Required Post-Annealing, and - Preparation and Application of the External Protective Layer. These operations would be affected by various process parameters which can be classified into: Chemistry and Material Related Parameters; and Engineering and Environmental Based Parameters. Thus, one can see that for successful development of the coated conductors manufacturing process, an

  20. Atomic layer epitaxy of YBaCuO for optoelectronic applications

    NASA Technical Reports Server (NTRS)

    Skogman, R. A.; Khan, M. A.; Van Hove, J. M.; Bhattarai, A.; Boord, W. T.

    1992-01-01

    An MOCVD-based atomic-layer epitaxy process is being developed as a potential solution to the problems of film-thickness and interface-abruptness control which are encountered when fabricating superconductor-insulator-superconductor devices using YBa2Cu3O(7-x). In initial studies, the atomic-layer MOCVD process yields superconducting YBa2Cu3O(7-x) films with substrate temperatures of 605 C during film growth, and no postdeposition anneal. The low temperature process yields a smooth film surface and can reduce interface degradation due to diffusion.

  1. Epitaxial Crystal Silicon Absorber Layers and Solar Cells Grown at 1.8 Microns per Minute

    SciTech Connect

    Bobela, D. C.; Teplin, C. W.; Young, D. L.; Branz, H. M.; Stradins, P.

    2011-01-01

    We have grown device-quality epitaxial silicon thin films at growth rates up to 1.85 {micro}m/min, using hot-wire chemical vapor deposition from silane, at substrate temperatures below 750 C. At these rates, which are more than 30 times faster than those used by the amorphous and nanocrystalline Si industry, capital costs for large-scale solar cell production would be dramatically reduced, even for cell absorber layers up to 10 {micro}m thick. We achieved high growth rates by optimizing the three key parameters: silane flow, depletion, and filament geometry, based on our model developed earlier. Hydrogen coverage of the filament surface likely limits silane decomposition and growth rate at high system pressures. No considerable deterioration in PV device performance is observed when grown at high rate, provided that the epitaxial growth is initiated at low rate. A simple mesa device structure (wafer/epi Si/a-Si(i)/a-Si:H(p)/ITO) with a 2.3 {micro}m thick epitaxial silicon absorber layer was grown at 0.7 {micro}m/min. The finished device had an open-circuit voltage of 0.424 V without hydrogenation treatment.

  2. Epitaxial Growth of Single Layer Blue Phosphorus: A New Phase of Two-Dimensional Phosphorus.

    PubMed

    Zhang, Jia Lin; Zhao, Songtao; Han, Cheng; Wang, Zhunzhun; Zhong, Shu; Sun, Shuo; Guo, Rui; Zhou, Xiong; Gu, Cheng Ding; Yuan, Kai Di; Li, Zhenyu; Chen, Wei

    2016-08-10

    Blue phosphorus, a previously unknown phase of phosphorus, has been recently predicted by theoretical calculations and shares its layered structure and high stability with black phosphorus, a rapidly rising two-dimensional material. Here, we report a molecular beam epitaxial growth of single layer blue phosphorus on Au(111) by using black phosphorus as precursor, through the combination of in situ low temperature scanning tunneling microscopy and density functional theory calculation. The structure of the as-grown single layer blue phosphorus on Au(111) is explained with a (4 × 4) blue phosphorus unit cell coinciding with a (5 × 5) Au(111) unit cell, and this is verified by the theoretical calculations. The electronic bandgap of single layer blue phosphorus on Au(111) is determined to be 1.10 eV by scanning tunneling spectroscopy measurement. The realization of epitaxial growth of large-scale and high quality atomic-layered blue phosphorus can enable the rapid development of novel electronic and optoelectronic devices based on this emerging two-dimensional material. PMID:27359041

  3. Distribution of the lateral correlation length in GaN epitaxial layers

    NASA Astrophysics Data System (ADS)

    Kozlowski, J.; Paszkiewicz, R.; Korbutowicz, R.; Tlaczala, M.

    2001-12-01

    GaN structures belong to the most popular wide-bandgap semiconductors. Large lattice mismatch existing between the layer and substrates (3.5% for SiC and even 16% in the case of sapphire substrate) results in structures with a large number of defects. The typical GaN epitaxial layer consists of dislocation-free regions with lateral dimensions equal to a few hundred nanometers. The dislocation density changes from 10 8 cm -2 inside the grains to 10 10 cm -2 in the grain boundaries. The average value of the lateral correlation lengths (coherence wavelength) seems to be not quite satisfactory. Particularly, it is connected with lateral direction, because the vertical length is approximately equal to the thickness of the epitaxial layer. This paper presents the new approach for the determination of GaN crystallites dislocation-free block size distributions. This method is based on the X-ray peak profile analysis and solution of the Fredholm integral equation. The necessary peaks are obtained from the high-resolution X-ray diffractometry measurements. The obtained results have been shown for the various samples: GaN layers grown on low temperature buffer layer (GaN or AlN). Very interesting results were obtained in the first case, where two different sizes of the blocks appear.

  4. Layer matching epitaxy of NiO thin films on atomically stepped sapphire (0001) substrates

    PubMed Central

    Yamauchi, Ryosuke; Hamasaki, Yosuke; Shibuya, Takuto; Saito, Akira; Tsuchimine, Nobuo; Koyama, Koji; Matsuda, Akifumi; Yoshimoto, Mamoru

    2015-01-01

    Thin-film epitaxy is critical for investigating the original properties of materials. To obtain epitaxial films, careful consideration of the external conditions, i.e. single-crystal substrate, temperature, deposition pressure and fabrication method, is significantly important. In particular, selection of the single-crystal substrate is the first step towards fabrication of a high-quality film. Sapphire (single-crystalline α-Al2O3) is commonly used in industry as a thin-film crystal-growth substrate, and functional thin-film materials deposited on sapphire substrates have found industrial applications. However, while sapphire is a single crystal, two types of atomic planes exist in accordance with step height. Here we discuss the need to consider the lattice mismatch for each of the sapphire atomic layers. Furthermore, through cross-sectional transmission electron microscopy analysis, we demonstrate the uniepitaxial growth of cubic crystalline thin films on bistepped sapphire (0001) substrates. PMID:26402241

  5. (abstract) All Epitaxial Edge-geometry SNS Devices with Doped PBCO and YBCO Normal Layers

    NASA Technical Reports Server (NTRS)

    Barner, J. B.; Hunt, B. D.; Foote, M. C.

    1995-01-01

    We will present our results on tapered-edge-geometry SNS weak link fabricated from c-axis oriented base-, counterelectrode and normal layers using a variety of processing conditions. To date, we have employed a variety of different normal materials (Co-doped YBCO, Y-doped PBCO, Ca-doped PBCO). We have been examining the junction fabrication process in detail and we will present our methods. In particular, we have been examining both epitaxial and non-epitaxial milling mask overlayers and we will present a comparison of both methods. These devices behave similar to the expectations of the resisively shunted junction model and conventional SNS proximity effect models but with some differences which will be discussed. We will present the detailed systematics of our junctions including device parameters versus temperature, rf and dc magnetic response for the various processing conditions.

  6. Selective epitaxial Si based layers and TiSi 2 deposition by integrated chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Regolini, J. L.; Margail, J.; Bodnar, S.; Maury, D.; Morin, C.

    1996-07-01

    High performance IC manufacturing requirements, such as large diameter wafer uniformity, reproducibility, throughput and reliability can be fulfilled by commercial integrated processing, single wafer cluster tools. This paper presents results obtained on an industrial cluster reactor for 200 mm wafers by combining epitaxial silicon related materials and selective deposition of TiSi 2. Low temperature epitaxial Si and SiGe alloys are studied for buried thin layers used in CMOS and HBT devices. The doping profile abruptness for B and P are within SIMS resolution limits. TheTiSi 2/Si selective deposition is also investigated, sequentially and in situ, as a technique for future salicidedS/D with a reduction in technological steps and interface contamination. Statistical electrical results obtained using 0.35 and 0.25 μm CMOS technologies in which the CVD silicide deposition is tested, are presented and compared with the standard salicide technique.

  7. Thermal conductivity as a metric for the crystalline quality of SrTiO{sub 3} epitaxial layers

    SciTech Connect

    Oh, Dong-Wook; Ravichandran, Jayakanth; Liang, Chen-Wei; Martin, Lane W.; Cahill, David G.; Siemons, Wolter; Jalan, Bharat; Stemmer, Susanne; Brooks, Charles M.; Schlom, Darrell G.; Huijben, Mark; Majumdar, Arun; Ramesh, Ramamoorthy

    2011-05-30

    Measurements of thermal conductivity {Lambda} by time-domain thermoreflectance in the temperature range 100epitaxial layers of a prototypical oxide, SrTiO{sub 3}. Twenty samples from five institutions using two growth techniques, molecular beam epitaxy and pulsed laser deposition (PLD), were analyzed. Optimized growth conditions produce layers with {Lambda} comparable to bulk single crystals. Many PLD layers, particularly those that use ceramics as the target material, show surprisingly low {Lambda}. For homoepitaxial layers, the decrease in {Lambda} created by point defects correlates well with the expansion of the lattice parameter in the direction normal to the surface.

  8. Thermal conductivity as a metric for the crystalline quality of SrTiO3 epitaxial layers

    SciTech Connect

    Oh, Dong-Wook; Ravichandran, Jayakanth; Liang, Chen-Wei; Siemons, Wolter; Jalan, Bharat; Brooks, Charles M.; Huijben, Mark; Schlom, Darrell G.; Stemmer, Susanne; Martin, Lane W.; Majumdar, Arun; Ramesh, Ramamoorthy; Cahill, David G.

    2011-01-01

    Measurements of thermal conductivity Λ by time-domain thermoreflectance in the temperature range 100 < T < 300 K are used to characterize the crystalline quality of epitaxial layers of a prototypical oxide, SrTiO₃. Twenty samples from five institutions using two growth techniques, molecular beam epitaxy and pulsed laser deposition (PLD), were analyzed. Optimized growth conditions produce layers with Λ comparable to bulk single crystals. Many PLD layers, particularly those that use ceramics as the target material, show surprisingly low Λ. For homoepitaxial layers, the decrease in Λ created by point defects correlates well with the expansion of the lattice parameter in the direction normal to the surface.

  9. Photoluminescence efficiency of BGaN epitaxial layers with high boron content

    NASA Astrophysics Data System (ADS)

    Jurkevičius, J.; Mickevičius, J.; Kadys, A.; Kolenda, M.; Tamulaitis, G.

    2016-07-01

    High-boron-content epitaxial layers of BGaN intended for lattice-matching with AlGaN in UV light emitters were grown on SiC substrate and GaN and AlN templates on sapphire. Photoluminescence (PL) of these layers was studied under quasi-steady-state conditions by varying temperature and excitation intensity. The PL spectra in the samples with different boron content and their dynamics evidence formation of boron-rich regions occupying a small fraction of the total layer volume and acting as the emission killers. The room-temperature PL efficiency of the BGaN epilayers was estimated and shown to drastically decrease at increasing boron content with no significant correlation with either the type of substrate/template or technological conditions of the layer deposition.

  10. Greatly improved interfacial passivation of in-situ high κ dielectric deposition on freshly grown molecule beam epitaxy Ge epitaxial layer on Ge(100)

    SciTech Connect

    Chu, R. L.; Liu, Y. C.; Lee, W. C.; Huang, M. L.; Kwo, J. E-mail: mhong@phys.ntu.edu.tw; Lin, T. D.; Hong, M. E-mail: mhong@phys.ntu.edu.tw; Pi, T. W.

    2014-05-19

    A high-quality high-κ/Ge interface has been achieved by combining molecule beam epitaxy grown Ge epitaxial layer and in-situ deposited high κ dielectric. The employment of Ge epitaxial layer has sucessfully buried and/or removed the residue of unfavorable carbon and native oxides on the chemically cleaned and ultra-high vacuum annealed Ge(100) wafer surface, as studied using angle-resolved x-ray photoelectron spectroscopy. Moreover, the scanning tunneling microscopy analyses showed the significant improvements in Ge surface roughness from 3.5 Å to 1 Å with the epi-layer growth. Thus, chemically cleaner, atomically more ordered, and morphologically smoother Ge surfaces were obtained for the subsquent deposition of high κ dielectrics, comparing with those substrates without Ge epi-layer. The capacitance-voltage (C-V) characteristics and low extracted interfacial trap density (D{sub it}) reveal the improved high-κ/Ge interface using the Ge epi-layer approach.

  11. Kinetics modeling and growth of Si layers by Liquid Phase Epitaxy Driven by Solvent Evaporation (LPESE)

    NASA Astrophysics Data System (ADS)

    Giraud, S.; Duffar, T.; Pihan, E.; Fave, A.

    2015-12-01

    Crystalline Si thin films on low-cost substrates are expected to be an alternative to bulk Si for PV applications. Liquid Phase Epitaxy (LPE) is one of the most suitable techniques for the growth of high quality Si layers since LPE is performed under almost equilibrium conditions. We investigated a growth technology which allows growing Si epitaxial thin films in steady temperature conditions through the control of solvent evaporation from a metallic solution saturated with silicon: Liquid Phase Epitaxy by Solvent Evaporation (LPESE). An analytical model aiming to predict solvent evaporation and Si crystallization rate is described and discussed for three solvents (Sn, In and Cu). Growth experiments are implemented in order to check the validity of the model. Experimental set up and growth procedure are presented. Si thin films were grown from Sn-Si and In-Si solution at temperatures between 900 and 1200 °C under high vacuum. The predicted solvent evaporation rate and Si growth rate are in agreement with the experimental measurements.

  12. Atomic layer deposition of perovskite oxides and their epitaxial integration with Si, Ge, and other semiconductors

    SciTech Connect

    McDaniel, Martin D.; Ngo, Thong Q.; Hu, Shen; Ekerdt, John G.; Posadas, Agham; Demkov, Alexander A.

    2015-12-15

    Atomic layer deposition (ALD) is a proven technique for the conformal deposition of oxide thin films with nanoscale thickness control. Most successful industrial applications have been with binary oxides, such as Al{sub 2}O{sub 3} and HfO{sub 2}. However, there has been much effort to deposit ternary oxides, such as perovskites (ABO{sub 3}), with desirable properties for advanced thin film applications. Distinct challenges are presented by the deposition of multi-component oxides using ALD. This review is intended to highlight the research of the many groups that have deposited perovskite oxides by ALD methods. Several commonalities between the studies are discussed. Special emphasis is put on precursor selection, deposition temperatures, and specific property performance (high-k, ferroelectric, ferromagnetic, etc.). Finally, the monolithic integration of perovskite oxides with semiconductors by ALD is reviewed. High-quality epitaxial growth of oxide thin films has traditionally been limited to physical vapor deposition techniques (e.g., molecular beam epitaxy). However, recent studies have demonstrated that epitaxial oxide thin films may be deposited on semiconductor substrates using ALD. This presents an exciting opportunity to integrate functional perovskite oxides for advanced semiconductor applications in a process that is economical and scalable.

  13. In situ etch treatments of silicon carbide epitaxial layer for morphological quality improvement of the surfaces

    NASA Astrophysics Data System (ADS)

    de Angelis, S.; Perrone, D.; Scaltrito, L.; Ferrero, S.; Pirri, C. F.; Mauceri, M.; Leone, S.; Pistone, G.; Abbondanza, G.; Crippa, D.

    2006-07-01

    Different homo epitaxial 4H-SiC commercial wafers were undergone hydrogen etching process that was developed in the reaction chamber of a Hot Wall Chemical Vapor Deposition (HWCVD) reactor. We have studied the effects of physical desorption to point out the morphology and the structural changes of epitaxial surfaces.An optical microscopy inspection was made to trace out a map of defect areas before and after etching treatments. We have analysed the morphological evolution of the surface in every etching process step by means of marked area on the defect map. We also achieved some other important information, concerning structural and morphological changing, by performing Atomic Force Microscopy and Micro Raman spectroscopy analysis on the same defect marked area.The etched epilayers showed a significant reduction of defects density and a good surface morphology. On investigated samples we fabricated Schottky diodes, their electrical behaviour compared to the devices fabricated on not etched epitaxial layer highlights the surface quality improvement and the increasing of SBD working yield.

  14. Towards precise defect control in layered oxide structures by using oxide molecular beam epitaxy

    PubMed Central

    Baiutti, Federico; Christiani, Georg

    2014-01-01

    Summary In this paper we present the atomic-layer-by-layer oxide molecular beam epitaxy (ALL-oxide MBE) which has been recently installed in the Max-Planck Institute for Solid State Research and we report on its present status, providing some examples that demonstrate its successful application in the synthesis of different layered oxides, with particular reference to superconducting La2CuO4 and insulator-to-metal La2− xSrxNiO4. We briefly review the ALL-oxide MBE technique and its unique capabilities in the deposition of atomically smooth single-crystal thin films of various complex oxides, artificial compounds and heterostructures, introducing our goal of pursuing a deep investigation of such systems with particular emphasis on structural defects, with the aim of tailoring their functional properties by precise defects control. PMID:24995148

  15. Towards precise defect control in layered oxide structures by using oxide molecular beam epitaxy.

    PubMed

    Baiutti, Federico; Christiani, Georg; Logvenov, Gennady

    2014-01-01

    In this paper we present the atomic-layer-by-layer oxide molecular beam epitaxy (ALL-oxide MBE) which has been recently installed in the Max-Planck Institute for Solid State Research and we report on its present status, providing some examples that demonstrate its successful application in the synthesis of different layered oxides, with particular reference to superconducting La2CuO4 and insulator-to-metal La2- x Sr x NiO4. We briefly review the ALL-oxide MBE technique and its unique capabilities in the deposition of atomically smooth single-crystal thin films of various complex oxides, artificial compounds and heterostructures, introducing our goal of pursuing a deep investigation of such systems with particular emphasis on structural defects, with the aim of tailoring their functional properties by precise defects control. PMID:24995148

  16. Epitaxial 1D electron transport layers for high-performance perovskite solar cells.

    PubMed

    Han, Gill Sang; Chung, Hyun Suk; Kim, Dong Hoe; Kim, Byeong Jo; Lee, Jin-Wook; Park, Nam-Gyu; Cho, In Sun; Lee, Jung-Kun; Lee, Sangwook; Jung, Hyun Suk

    2015-10-01

    We demonstrate high-performance perovskite solar cells with excellent electron transport properties using a one-dimensional (1D) electron transport layer (ETL). The 1D array-based ETL is comprised of 1D SnO2 nanowires (NWs) array grown on a F:SnO2 transparent conducting oxide substrate and rutile TiO2 nanoshells epitaxially grown on the surface of the 1D SnO2 NWs. The optimized devices show more than 95% internal quantum yield at 750 nm, and a power conversion efficiency (PCE) of 14.2%. The high quantum yield is attributed to dramatically enhanced electron transport in the epitaxial TiO2 layer, compared to that in conventional nanoparticle-based mesoporous TiO2 (mp-TiO2) layers. In addition, the open space in the 1D array-based ETL increases the prevalence of uniform TiO2/perovskite junctions, leading to reproducible device performance with a high fill factor. This work offers a method to achieve reproducible, high-efficiency perovskite solar cells with high-speed electron transport. PMID:26324759

  17. Atomic layer epitaxy of II-VI quantum wells and superlattices

    NASA Astrophysics Data System (ADS)

    Faschinger, W.

    1993-01-01

    Atomic Layer Epitaxy (ALE) under ultra high vacuum conditions is a variation of MBE which makes use of a self-regulating growth process, leading to digital growth in steps of monolayers or even fractions of monolayers. We report on fundamental aspects of the ALE growth of tellurides and selenides, and give three examples on the physics of ALE-grown structures: (a) Phonon confinement in CdTe/ZnTe superlattices (b) "Spin Sheet" superlattices of cubic MnTe with CdTe and (c) Luminescence tuning in ultra-thin CdSe quantum wells embedded in ZnSe.

  18. Effect of reactive ion beam etching on the photoluminescence of CdTe epitaxial layers

    SciTech Connect

    Martinez-Pastor, J.; Fuster, D.; Abellan, M.; Anguita, J.; Sochinskii, N. V.

    2008-03-01

    We demonstrated the effect of reactive ion beam etching (RIBE) process on the PL properties of CdTe/sapphire metal organic vapor phase epitaxy layers. At optimum conditions, the RIBE attack does not make significant morphological changes but it results in an increase of the concentration of acceptor impurities. This was revealed by an increase of the overall photoluminescence (PL) intensity and, simultaneously, a decrease of the PL decay time, more important on the low energy side of PL spectrum due to the recombination of carriers in acceptor pairs.

  19. Broadband electromagnetic response and ultrafast dynamics of few-layer epitaxial graphene

    SciTech Connect

    Choi, Hyunyong; Borondics, Ferenc; Siegel, David A.; Zhou, Shuyun Y.; Martin, Michael C.; Lanzara, Alessandra; Kaindl, Robert A.

    2009-03-26

    We study the broadband optical conductivity and ultrafast carrier dynamics of epitaxial graphene in the few-layer limit. Equilibrium spectra of nominally buffer, monolayer, and multilayer graphene exhibit significant terahertz and near-infrared absorption, consistent with a model of intra- and interband transitions in a dense Dirac electron plasma. Non-equilibrium terahertz transmission changes after photoexcitation are shown to be dominated by excess hole carriers, with a 1.2-ps mono-exponential decay that refects the minority-carrier recombination time.

  20. Growth and characterization of epitaxial aluminum layers on gallium-arsenide substrates for superconducting quantum bits

    NASA Astrophysics Data System (ADS)

    Tournet, J.; Gosselink, D.; Miao, G.-X.; Jaikissoon, M.; Langenberg, D.; McConkey, T. G.; Mariantoni, M.; Wasilewski, Z. R.

    2016-06-01

    The quest for a universal quantum computer has renewed interest in the growth of superconducting materials on semiconductor substrates. High-quality superconducting thin films will make it possible to improve the coherence time of superconducting quantum bits (qubits), i.e., to extend the time a qubit can store the amplitude and phase of a quantum state. The electrical losses in superconducting qubits highly depend on the quality of the metal layers the qubits are made from. Here, we report on the epitaxy of single-crystal Al (011) layers on GaAs (001) substrates. Layers with 110 nm thickness were deposited by means of molecular beam epitaxy at low temperature and monitored by in situ reflection high-energy electron diffraction performed simultaneously at four azimuths. The single-crystal nature of the layers was confirmed by ex situ high-resolution x-ray diffraction. Differential interference contrast and atomic force microscopy analysis of the sample’s surface revealed a featureless surface with root mean square roughness of 0.55 nm. A detailed in situ study allowed us to gain insight into the nucleation mechanisms of Al layers on GaAs, highlighting the importance of GaAs surface reconstruction in determining the final Al layer crystallographic orientation and quality. A highly uniform and stable GaAs (001)-(2× 4) reconstruction reproducibly led to a pure Al (011) phase, while an arsenic-rich GaAs (001)-(4× 4) reconstruction yielded polycrystalline films with an Al (111) dominant orientation. The near-atomic smoothness and single-crystal character of Al films on GaAs, in combination with the ability to trench GaAs substrates, could set a new standard for the fabrication of superconducting qubits.

  1. Growth and characterization of epitaxial layers of Ge on Si substrates

    SciTech Connect

    Fathy, D.; White, C.W.; Holland, O.W.

    1987-03-01

    Thin single crystalline layers of Ge with atomically sharp boundaries have been formed epitaxially on (100) Si substrates. This was done by /sup 74/Ge ion implantation into Si followed by steam oxidation. Using both Rutherford backscattering spectroscopy (RBS) and transmission electron microscopy (TEM), we have found that a Ge layer forms as a result of Ge segregated at the moving SiO/sub 2/ interface during steam oxidation. For a SiO/sub 2/ layer that has swept through the implanted region, essentially all of the Ge is snow-ploughed and no Ge is lost to the oxide layer. The Ge layers and its two bounding interfaces, i.e., Ge/SiO/sub 2/ and Ge/Si, have been characterized as a function of the implantation dose and energy. The thickness of the Ge layer formed is dependent on the implantation dose. Thicknesses from a fraction of a monolayer to greater than 50 monolayers of Ge can be formed on Si by this mechanism. Initially the Ge layer forms a coherent interface with the underlying Si with no misfit dislocations, and misfit dislocations only appear as the thickness of the film is increased.

  2. Characteristics of nucleation layer and epitaxy in GaN/sapphire heterostructures

    NASA Astrophysics Data System (ADS)

    Narayan, J.; Pant, Punam; Chugh, A.; Choi, H.; Fan, J. C. C.

    2006-03-01

    We present the details of GaN nucleation layer grown on (0001) sapphire substrates below 600 °C by metal organic chemical vapor deposition. These films have cubic (c-GaN) zinc blende structure which starts to transform into a hexagonal (h-GaN) wurtzite structure upon annealing around 650 °C and above. The films deposited above 700 °C by pulsed laser deposition directly on sapphire substrate showed the wurtzite structure. Both c-GaN and h-GaN films grow epitaxially on (0001) sapphire substrates via domain matching epitaxy, where integral multiples of planes match across the film-substrate interface. The c-GaN has the following epitaxial relationship: <111>c-GaN∥<0001>sap, <110>c-GaN∥<10-10>sap, and <211>c-GaN∥<-2110>sap. In terms of planar matching, (220) planes of c-GaN match with (30-30) planes of sapphire, and 1/3(422) planes of c-GaN match with (-2110) planes of sapphire in the perpendicular direction. The transformation from c-GaN into h-GaN involves the transformation of (220) planes of c-GaN into (-2110) planes of h-GaN and 1/3(422) planes of c-GaN into (30-30) planes of h-GaN, and the epitaxial relationship changes to <0001>h-GaN∥<0001>sap and <-2110>h-GaN∥<10-10>sap. In terms of planar matching epitaxy, (-2110) planes of h-GaN match with (30-30) planes of sapphire, and, in the perpendicular direction, (30-30) planes of h-GaN match with (-2110) planes of sapphire. This epitaxial relationship is known as 30° or 90° rotation. It is interesting to note that relative spacing for c-GaN as well as h-GaN planes remains the same during this transformation because of a(c-GaN)=√2a(h-GaN)=√3c(h-GaN)/2 equivalence between lattice constants of cubic and hexagonal structures. The transformation from cubic to hexagonal structure can occur via insertion or removal of stacking faults in {111} planes of c-GaN and {0001} planes of h-GaN. The hexagonal structure is preferred as a template for higher-temperature growth, however, the cubic structure, which is a

  3. Effect of surface nitridation on the epitaxial growth of few-layer sp2 BN

    NASA Astrophysics Data System (ADS)

    Snure, Michael; Paduano, Qing; Kiefer, Arnold

    2016-02-01

    Boron Nitride is a promising 2D dielectric material for use in numerous electronic applications. In order to realize this potential, a process for producing atomically thin layers on microelectronics-compatible substrates is desirable. In this paper we describe an approach to epitaxially grow few-layer sp2 BN directly on an insulating substrate, using metal-organic chemical vapor deposition (MOCVD). We also elucidate the effect of sapphire surface nitridation on the growth characteristics. We compare the effect of nitridation on the growth rate, surface morphology and structure across a wide range of V/III ratios. Depending on the V/III ratio, two different growth modes were identified: at low V/III 3D island growth is dominant and at high V/III the growth transitions to a self-terminating mode. Under self-terminating growth a film thickness of 1.5 nm is typically achieved. Surface nitridation was found to improve nucleation, promoting self-terminating growth, and resulting in atomically smooth films. Reflection high energy electron diffraction (RHEED) patterns reveal the epitaxial relationship between BN and sapphire to be [1-100]‖[11-20] and [0001]‖[0001]. Growth at low V/III ratios without surface nitridation produced films with large hexagonal holes, which could not be completely filled by extending the growth time. Through surface nitridation, these holes were eliminated, producing continuous smooth films.

  4. Formation of large-grain-sized BaSi2 epitaxial layers grown on Si(111) by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Baba, M.; Toh, K.; Toko, K.; Hara, K. O.; Usami, N.; Saito, N.; Yoshizawa, N.; Suemasu, T.

    2013-09-01

    BaSi2 epitaxial films were grown on Si(111) substrates by a two-step growth method including reactive deposition epitaxy (RDE) and molecular beam epitaxy (MBE). To enlarge the grain size of BaSi2, the Ba deposition rate and duration were varied from 0.25 to 1.0 nm/min and from 5 to 120 min during RDE, respectively. The effect of post-annealing was also investigated at 760 °C for 10 min. Plan-view transmission electron micrographs indicated that the grain size in the MBE-grown BaSi2 was significantly increased up to approximately 4.0 μm, which is much larger than 0.2 μm, reported previously.

  5. Few layer epitaxial germanene: a novel two-dimensional Dirac material

    NASA Astrophysics Data System (ADS)

    Dávila, María Eugenia; Le Lay, Guy

    2016-02-01

    Monolayer germanene, a novel graphene-like germanium allotrope akin to silicene has been recently grown on metallic substrates. Lying directly on the metal surfaces the reconstructed atom-thin sheets are prone to lose the massless Dirac fermion character and unique associated physical properties of free standing germanene. Here, we show that few layer germanene, which we create by dry epitaxy on a gold template, possesses Dirac cones thanks to a reduced interaction. This finding established on synchrotron-radiation-based photoemission, scanning tunneling microscopy imaging and surface electron diffraction places few layer germanene among the rare two-dimensional Dirac materials. Since germanium is currently used in the mainstream Si-based electronics, perspectives of using germanene for scaling down beyond the 5 nm node appear very promising. Other fascinating properties seem at hand, typically the robust quantum spin Hall effect for applications in spintronics and the engineering of Floquet Majorana fermions by light for quantum computing.

  6. Few layer epitaxial germanene: a novel two-dimensional Dirac material.

    PubMed

    Dávila, María Eugenia; Le Lay, Guy

    2016-01-01

    Monolayer germanene, a novel graphene-like germanium allotrope akin to silicene has been recently grown on metallic substrates. Lying directly on the metal surfaces the reconstructed atom-thin sheets are prone to lose the massless Dirac fermion character and unique associated physical properties of free standing germanene. Here, we show that few layer germanene, which we create by dry epitaxy on a gold template, possesses Dirac cones thanks to a reduced interaction. This finding established on synchrotron-radiation-based photoemission, scanning tunneling microscopy imaging and surface electron diffraction places few layer germanene among the rare two-dimensional Dirac materials. Since germanium is currently used in the mainstream Si-based electronics, perspectives of using germanene for scaling down beyond the 5 nm node appear very promising. Other fascinating properties seem at hand, typically the robust quantum spin Hall effect for applications in spintronics and the engineering of Floquet Majorana fermions by light for quantum computing. PMID:26860590

  7. Tilt and dislocations in epitaxial laterally overgrown GaAs layers

    NASA Astrophysics Data System (ADS)

    Zytkiewicz, Z. R.; Domagala, J. Z.; Dobosz, D.; Dobaczewski, L.; Rocher, A.; Clement, C.; Crestou, J.

    2007-01-01

    Transmission electron microscopy (TEM) and high-resolution x-ray diffraction were used to study the crystalline quality of GaAs layers grown by liquid phase epitaxial lateral overgrowth (ELO) on SiO2-masked (001) GaAs substrates. A low-angle grain boundary with a well-organized set of dislocations accommodating the misorientation of tilted ELO wings was found at the coalescence front of ELO layers. Similar behavior is often reported for GaN on sapphire ELO structures. Unlike the GaN case, however, no dislocations were found above edges of the mask, which is explained by the much smaller wing tilt angle in our case. The geometry of the dislocation network and analysis of thickness fringes on TEM images were used to measure misorientation of merging ELO wings. The values obtained are in good agreement with those determined by x-ray diffraction.

  8. Few layer epitaxial germanene: a novel two-dimensional Dirac material

    PubMed Central

    Dávila, María Eugenia; Le Lay, Guy

    2016-01-01

    Monolayer germanene, a novel graphene-like germanium allotrope akin to silicene has been recently grown on metallic substrates. Lying directly on the metal surfaces the reconstructed atom-thin sheets are prone to lose the massless Dirac fermion character and unique associated physical properties of free standing germanene. Here, we show that few layer germanene, which we create by dry epitaxy on a gold template, possesses Dirac cones thanks to a reduced interaction. This finding established on synchrotron-radiation-based photoemission, scanning tunneling microscopy imaging and surface electron diffraction places few layer germanene among the rare two-dimensional Dirac materials. Since germanium is currently used in the mainstream Si-based electronics, perspectives of using germanene for scaling down beyond the 5 nm node appear very promising. Other fascinating properties seem at hand, typically the robust quantum spin Hall effect for applications in spintronics and the engineering of Floquet Majorana fermions by light for quantum computing. PMID:26860590

  9. Influence of layer thickness on the structure and the magnetic properties of Co/Pd epitaxial multilayer films

    NASA Astrophysics Data System (ADS)

    Tobari, Kousuke; Ohtake, Mitsuru; Nagano, Katsumasa; Futamoto, Masaaki

    2012-03-01

    Co/Pd epitaxial multilayer films were prepared on Pd(111)fcc underlayers hetero-epitaxially grown on MgO(111)B1 single-crystal substrates at room temperature by ultra-high vacuum RF magnetron sputtering. In-situ reflection high energy electron diffraction shows that the in-plane lattice spacing of Co on Pd layer gradually decreases with increasing the Co layer thickness, whereas that of Pd on Co layer remains unchanged during the Pd layer formation. The CoPd alloy phase formation is observed around the Co/Pd interface. The atomic mixing is enhanced for thinner Co and Pd layers in multilayer structure. With decreasing the Co and the Pd layer thicknesses and increasing the repetition number of Co/Pd multilayer film, stronger perpendicular magnetic anisotropy is observed. The relationships between the film structure and the magnetic properties are discussed.

  10. Influence of a thin interfacial oxide layer on the ion beam assisted epitaxial crystallization of deposited Si

    NASA Astrophysics Data System (ADS)

    Priolo, F.; La Ferla, A.; Spinella, C.; Rimini, E.; Ferla, G.; Baroetto, F.; Licciardello, A.

    1988-12-01

    The epitaxial crystallization of chemical vapor deposited Si layers on <100> Si substrates with a thin interfacial oxide layer was induced by a 600 keV Kr beam in the temperature range 350-500 °C. During irradiation the single crystal-amorphous interface velocity was measured in situ by monitoring the reflectivity of He-Ne laser light. We show that a critical irradiation dose is needed before the interfacial oxide breaks down and epitaxial regrowth can take place. This critical dose depends exponentially on the reciprocal temperature with an activation energy of 0.44 eV.

  11. Structural and electronic properties of manganese-doped Bi2Te3 epitaxial layers

    NASA Astrophysics Data System (ADS)

    Růžička, J.; Caha, O.; Holý, V.; Steiner, H.; Volobuiev, V.; Ney, A.; Bauer, G.; Duchoň, T.; Veltruská, K.; Khalakhan, I.; Matolín, V.; Schwier, E. F.; Iwasawa, H.; Shimada, K.; Springholz, G.

    2015-01-01

    We show that in manganese-doped topological insulator bismuth telluride layers, Mn atoms are incorporated predominantly as interstitials in the van der Waals gaps between the quintuple layers and not substitutionally on Bi sites within the quintuple layers. The structural properties of epitaxial layers with Mn concentration of up to 13% are studied by high-resolution x-ray diffraction, evidencing a shrinking of both the in-plane and out-of plane lattice parameters with increasing Mn content. Ferromagnetism sets in for Mn contents around 3% and the Curie temperatures rises up to 15 K for a Mn concentration of 9%. The easy magnetization axis is along the c-axis perpendicular to the (0001) epilayer plane. Angle-resolved photoemission spectroscopy reveals that the Fermi level is situated in the conduction band and no evidence for a gap opening at the topological surface state with the Dirac cone dispersion is found within the experimental resolution at temperatures close to the Curie temperature. From the detailed analysis of the extended x-ray absorption fine-structure experiments (EXAFS) performed at the MnK-edge, we demonstrate that the Mn atoms occupy interstitial positions within the van der Waals gap and are surrounded octahedrally by Te atoms of the adjacent quintuple layers.

  12. Epitaxial 1D electron transport layers for high-performance perovskite solar cells

    NASA Astrophysics Data System (ADS)

    Han, Gill Sang; Chung, Hyun Suk; Kim, Dong Hoe; Kim, Byeong Jo; Lee, Jin-Wook; Park, Nam-Gyu; Cho, In Sun; Lee, Jung-Kun; Lee, Sangwook; Jung, Hyun Suk

    2015-09-01

    We demonstrate high-performance perovskite solar cells with excellent electron transport properties using a one-dimensional (1D) electron transport layer (ETL). The 1D array-based ETL is comprised of 1D SnO2 nanowires (NWs) array grown on a F:SnO2 transparent conducting oxide substrate and rutile TiO2 nanoshells epitaxially grown on the surface of the 1D SnO2 NWs. The optimized devices show more than 95% internal quantum yield at 750 nm, and a power conversion efficiency (PCE) of 14.2%. The high quantum yield is attributed to dramatically enhanced electron transport in the epitaxial TiO2 layer, compared to that in conventional nanoparticle-based mesoporous TiO2 (mp-TiO2) layers. In addition, the open space in the 1D array-based ETL increases the prevalence of uniform TiO2/perovskite junctions, leading to reproducible device performance with a high fill factor. This work offers a method to achieve reproducible, high-efficiency perovskite solar cells with high-speed electron transport.We demonstrate high-performance perovskite solar cells with excellent electron transport properties using a one-dimensional (1D) electron transport layer (ETL). The 1D array-based ETL is comprised of 1D SnO2 nanowires (NWs) array grown on a F:SnO2 transparent conducting oxide substrate and rutile TiO2 nanoshells epitaxially grown on the surface of the 1D SnO2 NWs. The optimized devices show more than 95% internal quantum yield at 750 nm, and a power conversion efficiency (PCE) of 14.2%. The high quantum yield is attributed to dramatically enhanced electron transport in the epitaxial TiO2 layer, compared to that in conventional nanoparticle-based mesoporous TiO2 (mp-TiO2) layers. In addition, the open space in the 1D array-based ETL increases the prevalence of uniform TiO2/perovskite junctions, leading to reproducible device performance with a high fill factor. This work offers a method to achieve reproducible, high-efficiency perovskite solar cells with high-speed electron transport

  13. Relaxation of strain during solid phase epitaxial growth of Ge + ion implanted layers in silicon

    NASA Astrophysics Data System (ADS)

    Holmén, G.; Songsiriritthigul, Prayoon

    1998-09-01

    Formation of Si 1- xGe x-alloy layers by solid phase epitaxial growth (SPEG) of Ge + ion implanted silicon has been studied. The ion implantations were performed with 40, 100, 150, 200 and 300 keV 74Ge + ions and various ion doses. The SPEG of the ion implanted layers was carried out in a conventional furnace at 850°C for 20 min under a flow of nitrogen gas. The Si 1- xGe x-alloy layers were characterised by Rutherford backscattering spectrometry and transmission electron microscopy (TEM). For a given ion energy, a Si 1- xGe x-alloy layer with no observable extended defects can be manufactured if the ion dose is below a critical value and strain-induced defects are formed in the alloy layer when the ion dose is equal to or above this value. The critical Ge + ion dose increases with ion energy, while the critical maximum Ge concentration decreases. For ion energies ⩽150 keV, the defects observed in the alloy layers are mostly stacking faults parallel to the {1 1 1} planes. For higher ion energies, 200 keV and above, the majority of defects in the alloy layer are hairpin dislocations. In the whole ion energy range, the critical ion dose and the depth position of the nucleation site for the stacking faults obtained from the measurements are in good agreement with theoretical predictions. Extended defects are formed in the alloy layer during the SPEG when the regrowth of the crystalline/amorphous interface has reached the depth position in the crystal where the accumulated strain energy density is equal to the critical value of 235 mJ/m 2.

  14. Characterization of mismatched SiGe grown on low temperature Si buffer layers by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Linder, K. K.; Zhang, F. C.; Rieh, J.-S.; Bhattacharya, P.

    1997-05-01

    Several types of buffer layer structures, including superlattice and step-graded layers, have been employed to reduce the threading dislocation in SiGe epitaxial layers. A new technique, using a 0.1 μm thick Si buffer grown at 450°C by molecular beam epitaxy, provides the best results. For a 0.5 μm thick Si 0.85Ge 0.15 layer, the dislocation density is ⩽ 10 5cm -2. Hall measurements indicate an improvement in the hole mobility of a 1 μm thick Boron doped Si 0.7Ge 0.3 layer. A {SiGe}/{Si} heterojunction bipolar transistor has been fabricated exploiting the low temperature Si buffer. Transmission electron microscopy of the structure does not indicate any evidence of threading dislocations.

  15. Atomic Layer Epitaxy of Si and Ge on Si(100)-(2x1)

    NASA Astrophysics Data System (ADS)

    Veyan, Jean-Francois; Choi, Heesung; Ballard, Joshua; McDonnell, Stephen; Kirk, Willey P.; Wallace, Robert M.; Randall, John; Cho, Kyeongjae; Chabal, Yves J.

    2011-03-01

    Atomic Layer Epitaxy of Si and Ge on Si(100) surface using disilane (Si 2 H6) and digermane (Ge 2 H6) as precursors is a critical step for constructing 3-D nano-structures, and is indispensable for Atomically Precise Manufacturing of new devices such as quantum dots. Using IRAS and STM together with DFT calculations, we show that Si 2 H6 chemisorbs on clean Si(100)-(2x1) via beta-hydride elimination pathway, involving the intermediate states Si-H and Si- Si H2 - Si H3 . Thermal decomposition of the chemisorbed Si 2 H5 leads to the formation of Si 2 H2 as an added dimer rotated 90 degrees with respect to the initial dimer row. A similar chemisorption pathway is observed for Ge 2 H6 on Si(100)x(2x1). The thermal decomposition of Ge 2 H5 involves the migration of H from Ge to Si, and Ge ad-dimer formation. Evidence for Ge epitaxial growth on Si(100)x(2x1) using Ge 2 H6 will be presented.

  16. Fe-doped InN layers grown by molecular beam epitaxy

    SciTech Connect

    Wang Xinqiang; Liu Shitao; Ma Dingyu; Zheng Xiantong; Chen Guang; Xu Fujun; Tang Ning; Shen Bo; Zhang Peng; Cao Xingzhong; Wang Baoyi; Huang Sen; Chen, Kevin J.; Zhou Shengqiang; Yoshikawa, Akihiko

    2012-10-22

    Iron(Fe)-doped InN (InN:Fe) layers have been grown by molecular beam epitaxy. It is found that Fe-doping leads to drastic increase of residual electron concentration, which is different from the semi-insulating property of Fe-doped GaN. However, this heavy n-type doping cannot be fully explained by doped Fe-concentration ([Fe]). Further analysis shows that more unintentionally doped impurities such as hydrogen and oxygen are incorporated with increasing [Fe] and the surface is degraded with high density pits, which probably are the main reasons for electron generation and mobility reduction. Photoluminescence of InN is gradually quenched by Fe-doping. This work shows that Fe-doping is one of good choices to control electron density in InN.

  17. Epitaxial strain effects on layered polar oxides from first-principles

    NASA Astrophysics Data System (ADS)

    Lu, Xuezeng; Rondinelli, James; Materials Theory; Design Group Team

    Epitaxial strain is a powerful tool to generate ferroelectric phases in thin films owing to polarization-strain coupling. The coupling of the oxygen rotations to strain can also be exploited to realize oxygen rotation-sensitive properties such as metal-insulator transitions and magnetic reconstructions. Here, we use electronic structure calculations to investigate the effects of biaxial strain on (001) thin films of the hybrid-improper ferroelectric Ca3Ti2O7. Besides the bulk Cmc21 phase, we also find a new phase emerges under both experimentally accessible biaxial compressive and tensile strains. Furthermore, a large change in the dielectric anisotropy of the film is found at the tensile phase boundary, which we propose could be electric field tunable. Our results may offer a route to search for new functionalities in layered-perovskite oxides.

  18. Effect of As Passivation on Vapor-Phase Epitaxial Growth of Ge on (211)Si as a Buffer Layer for CdTe Epitaxy

    NASA Astrophysics Data System (ADS)

    Shintri, Shashidhar; Rao, Sunil; Sarney, Wendy; Garg, Saurabh; Palosz, Witold; Trivedi, Sudhir; Wijewarnasuriya, Priyalal; Bhat, Ishwara

    2011-08-01

    We report an investigation of epitaxial germanium grown by chemical vapor deposition (CVD) on arsenic-terminated (211)Si, which is the preferred substrate in the USA for fabrication of night-vision devices based on mercury cadmium telluride (MCT) grown by molecular-beam epitaxy (MBE). The films were characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM), cross-sectional transmission electron microscopy (XTEM), and x-ray diffraction (XRD). Arsenic passivation was found to be effective in preventing cross-contamination of unwanted residual species present inside the reactor chamber and also in prolonging the evolution of layer-by-layer growth of Ge for significantly more monolayers than on nonpassivated Si. The two-dimensional (2D) to three-dimensional (3D) transition resulted in Ge islands, the density and morphology of which showed a clear distinction between passivated and nonpassivated (211)Si. Finally, thick Ge layers (˜250 nm) were grown at 525°C and 675°C with and without As passivation, where the layers grown with As passivation resulted in higher crystal quality and smooth surface morphology.

  19. The structure and photoconductivity of SiGe/Si epitaxial layers modified by single-pulse laser radiation

    NASA Astrophysics Data System (ADS)

    Ivlev, G. D.; Kazuchits, N. M.; Prakopyeu, S. L.; Rusetsky, M. S.; Gaiduk, P. I.

    2014-12-01

    The effect of nanosecond pulses of ruby laser radiation on the structural state and morphology of the epitaxial layers of a SiO0.5Ge0.5 solid solution on silicon with the initiation of a crystal-melt phase transition has been studied by electron microscopy. Data on the photoelectric parameters of the laser-modified layers having a cellular structure owing to the segregation of germanium during the solidification of the binary melt have been derived.

  20. Heat resistive dielectric multi-layer micro-mirror array in epitaxial lateral overgrowth gallium nitride.

    PubMed

    Huang, Chen-Yang; Ku, Hao-Min; Liao, Wei-Tsai; Chao, Chu-Li; Tsay, Jenq-Dar; Chao, Shiuh

    2009-03-30

    Ta2O5 / SiO2 dielectric multi-layer micro-mirror array (MMA) with 3mm mirror size and 6mm array period was fabricated on c-plane sapphire substrate. The MMA was subjected to 1200 degrees C high temperature annealing and remained intact with high reflectance in contrast to the continuous multi-layer for which the layers have undergone severe damage by 1200 degrees C annealing. Epitaxial lateral overgrowth (ELO) of gallium nitride (GaN) was applied to the MMA that was deposited on both sapphire and sapphire with 2:56 mm GaN template. The MMA was fully embedded in the ELO GaN and remained intact. The result implies that our MMA is compatible to the high temperature growth environment of GaN and the MMA could be incorporated into the structure of the micro-LED array as a one to one micro backlight reflector, or as the patterned structure on the large area LED for controlling the output light. PMID:19333330

  1. Three-wave diffraction in damaged epitaxial layers with a wurtzite structure

    NASA Astrophysics Data System (ADS)

    Kyutt, R. N.

    2011-05-01

    Three-wave diffraction of X-rays is measured using the Renninger scheme for a series of GaN epitaxial layers of various thicknesses and degrees of structural perfection. In each 30°-angular interval of azimuthal rotation, all ten three-wave peaks determined by the geometry of diffraction with the 0001 first forbidden reflection and Cu K α radiation are observed. The φ- and θ-scanned diffraction curves are measured for each three-wave combination. The angular FWHM of the diffraction peaks formed in experiments and its relation with the parameters of the two-wave diffraction pattern and the dislocation structure of the layers are analyzed. It is shown that the φ-scan peaks are less sensitive to the degree of structural perfection than the γ-mode peaks. The strongest dependence on the dislocation density for the latter peaks is observed for the (1bar 100)/(bar 1101) and (3bar 2bar 10)/(bar 3211) three-wave combinations with a pure Laue component of secondary radiation, while the (01bar 13)/(0bar 11bar 2) combination with a large Bragg component exhibits the weakest dependence. Splitting of three-wave Renninger peaks associated with the coarse-block structure of some of the layers with rotations of the blocks about the normal to the surface is detected. The total integrated intensity of all three-wave combinations is determined and their ratios are in qualitative agreement with the theory.

  2. Vertical heterostructures of layered metal chalcogenides by van der Waals epitaxy.

    PubMed

    Zhang, Xingwang; Meng, Fei; Christianson, Jeffrey R; Arroyo-Torres, Christian; Lukowski, Mark A; Liang, Dong; Schmidt, J R; Jin, Song

    2014-06-11

    We report a facile chemical vapor deposition (CVD) growth of vertical heterostructures of layered metal dichalcogenides (MX2) enabled by van der Waals epitaxy. Few layers of MoS2, WS2, and WSe2 were grown uniformly onto microplates of SnS2 under mild CVD reaction conditions (<500 °C) and the heteroepitaxy between them was confirmed using cross-sectional transmission electron microscopy (TEM) and unequivocally characterized by resolving the large-area Moiré patterns that appeared on the basal planes of microplates in conventional TEM (nonsectioned). Additional photoluminescence peaks were observed in heterostructures of MoS2-SnS2, which can be understood with electronic structure calculations to likely result from electronic coupling and charge separation between MoS2 and SnS2 layers. This work opens up the exploration of large-area heterostructures of diverse MX2 nanomaterials as the material platform for electronic structure engineering of atomically thin two-dimensional (2D) semiconducting heterostructures and device applications. PMID:24798138

  3. Atomic Layers: Tellurium-Assisted Epitaxial Growth of Large-Area, Highly Crystalline ReS2 Atomic Layers on Mica Substrate (Adv. Mater. 25/2016).

    PubMed

    Cui, Fangfang; Wang, Cong; Li, Xiaobo; Wang, Gang; Liu, Kaiqiang; Yang, Zhou; Feng, Qingliang; Liang, Xing; Zhang, Zhongyue; Liu, Shengzhong; Lei, Zhibin; Liu, Zonghuai; Xu, Hua; Zhang, Jin

    2016-07-01

    H. Xu, J. Zhang, and co-workers synthesize anisotropic 2D-layered rhenium disulfide with high crystal quality and uniform monolayer thickness. As described on page 5019, tellurium-assisted epitaxial growth on a mica substrate is chosen to generate such structures. PMID:27372721

  4. Tuning of strain and surface roughness of porous silicon layers for higher-quality seeds for epitaxial growth

    NASA Astrophysics Data System (ADS)

    Karim, Marwa; Martini, Roberto; Radhakrishnan, Hariharsudan Sivaramakrishnan; van Nieuwenhuysen, Kris; Depauw, Valerie; Ramadan, Wedgan; Gordon, Ivan; Poortmans, Jef

    2014-07-01

    Sintered porous silicon is a well-known seed for homo-epitaxy that enables fabricating transferrable monocrystalline foils. The crystalline quality of these foils depends on the surface roughness and the strain of this porous seed, which should both be minimized. In order to provide guidelines for an optimum foil growth, we present a systematic investigation of the impact of the thickness of this seed and of its sintering time prior to epitaxial growth on strain and surface roughness. Strain and surface roughness were monitored in monolayers and double layers with different porosities as a function of seed thickness and of sintering time by high-resolution X-ray diffraction and profilometry, respectively. Unexpectedly, we found that strain in double and monolayers evolves in opposite ways with respect to layer thickness. This suggests that an interaction between layers in multiple stacks is to be considered. We also found that if higher seed thickness and longer annealing time are to be preferred to minimize the strain in double layers, the opposite is required to achieve smoother layers. The impact of these two parameters may be explained by considering the morphological evolution of the pores upon sintering and, in particular, the disappearance of interconnections between the porous seed and the bulk as well as the enlargement of pores near the surface. An optimum epitaxial growth hence calls for a trade-off in seed thickness and annealing time, between minimum-strained layers and rougher surfaces.

  5. Nucleation and coalescence behavior for epitaxial ZnO layers on ZnO/sapphire templates grown by halide vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Fujii, Tetsuo; Yoshii, Naoki; Masuda, Rui; Tanabe, Tetsuhiro; Kamisawa, Akira; Hosaka, Shigetoshi; Kumagai, Yoshinao; Koukitu, Akinori

    2009-02-01

    The effects of growth conditions for ZnO layers grown by halide vapor phase epitaxy (HVPE) on (0 0 0 1) ZnO/sapphire templates are investigated. Micron-sized pyramidal ZnO islands nucleate on the template at the initial growth stage and each island grows differently with the process conditions. The high temperature of 1000 °C promotes a lateral growth rate and coalescence between the islands. The full-width at half-maximums (FWHMs) of X-ray rocking curves for the (0 0 0 2) and (1 0 1¯ 1) planes from a fully coalesced ZnO layer are quite narrow values below 160 arcsec. Transmission electron microscopy (TEM) reveals that screw character dislocations in the template do not propagate into the HVPE-grown layer.

  6. The Structural Quality of AlxGa1-xN Epitaxial Layers Grown by Digitally-AlloyedModulated Precursor Epitaxy Determined by Transmission Electron Microscopy

    SciTech Connect

    Hawkridge, Michael E; Liliental-Weber, Zuzanna; Kim, Hee Jin; Choi, Suk; Yoo, Dongwon; Ryou, Jae-Hyun; Dupuis, Russell

    2008-10-13

    Al(x)Ga(1-x)N layers of varying composition (0.5epitaxial regime employing AlN and GaN binary sub-layers by metalorganic chemical vapor deposition on AlN templates were characterized by transmission electron microscopy techniques. Fine lamellae were observed in bright field images that indicate a possible variation in composition due to the modulated nature of growth. In higher Ga content samples (x(Al)<0.75), a compositional inhomogeniety associated with thicker island regions was observed, which is determined to be due to large Ga-rich areas formed at the base of the layer. Possible causes for the separation of Ga-rich material are discussed in the context of the growth regime used.

  7. Study of optical properties of GaAsN layers prepared by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Pulzara-Mora, A.; Cruz-Hernández, E.; Rojas-Ramirez, J.; Contreras-Guerrero, R.; Meléndez-Lira, M.; Falcony-Guajardo, C.; Aguilar-Frutis, M. A.; López-López, M.

    2007-04-01

    We have grown GaAsN layers (with nitrogen concentration between 1.2% and 3.2%) on GaAs(1 0 0) substrates by molecular beam epitaxy (MBE) using a radio frequency (RF) plasma nitrogen source, and solid sources for Ga and As. The growth temperature was varied from 420 to 600 °C, and the GaAsN growth mode was in situ monitored by reflection high-energy electron diffraction (RHEED). The optical properties of the layers were studied by photoreflectance spectroscopy (PR) and phase modulated ellipsometry (PME). For the growth temperature of 420 °C the films grew in a three-dimensional (3D) mode as indicated by the appearance of transmission spots in the RHEED patterns. In contrast, GaAsN layers grown at higher temperatures presented a two-dimensional (2D) growth mode. These GaAsN layers are pseudomorphic according to high-resolution X-ray diffraction (HRXRD). The PR spectra of all samples exhibited Franz-Keldysh oscillations (FKO) above of the GaAs band gap energy. From these oscillations we obtained the built-in internal electric field intensity ( Fint) at the GaAsN/GaAs interface. In the low-energy region of the PR spectra we observed the transitions associated to fundamental band gap of the GaAsN layers. The variation of the GaAsN fundamental band gap obtained by PR as a function of the N content was explained according the band anti-crossing model (BAC). On the other hand, the E1 and E1+Δ E1 critical points were obtained from the analysis of spectra of the imaginary part of the dielectric function obtained by PME. We observed a shift of these critical points to higher energies with the increase of N content, which was explained by a combination of strain and alloying effects.

  8. Epitaxial ZnO/Pt layered structures and ZnO-Pt nanodot composites on sapphire (0001)

    NASA Astrophysics Data System (ADS)

    Chugh, Amit; Ramachandran, S.; Tiwari, A.; Narayan, J.

    2006-05-01

    We report the epitaxial growth and properties of ZnO-Pt layered structures and ZnO-Pt nanodot composites on sapphire (0001) substrates fabricated by using the pulsed laser deposition (PLD) technique. Heteroepitaxial growth of these structures was accomplished by using domain-matching epitaxy. The heterostructures were characterized using x-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM), optical transmittance, photoluminescence, and electrical resistivity measurements. XRD and HRTEM experiments revealed the epitaxial nature of these structures, with orientation relationship between ZnO and Pt, as [0001]ZnO∥[111]Pt and [bar 2110]ZnO∥[011]Pt, which is equivalent to no rotation between ZnO and Pt. For Pt epitaxy on (0001) sapphire, the epitaxial relationship was determined to be [001]Pt∥[0001]Sap and [110]Pt∥[01bar 10]Sap, which is equivalent to a 30° rotation in the basal plane. Electrical and optical measurements showed that these heterostructures exhibit very high electrical conductivity and at the same time possess interesting optical transmittance spectra and exhibit room temperature photoluminescence characteristics.

  9. A nitride-based epitaxial surface layer formed by ammonia treatment of silicene-terminated ZrB2

    NASA Astrophysics Data System (ADS)

    Wiggers, F. B.; Van Bui, H.; Friedlein, R.; Yamada-Takamura, Y.; Schmitz, J.; Kovalgin, A. Y.; de Jong, M. P.

    2016-04-01

    We present a method for the formation of an epitaxial surface layer involving B, N, and Si atoms on a ZrB2(0001) thin film on Si(111). It has the potential to be an insulating growth template for 2D semiconductors. The chemical reaction of NH3 molecules with the silicene-terminated ZrB2 surface was characterized by synchrotron-based, high-resolution core-level photoelectron spectroscopy and low-energy electron diffraction. In particular, the dissociative chemisorption of NH3 at 400 °C leads to surface nitridation, and subsequent annealing up to 830 °C results in a solid phase reaction with the ZrB2 subsurface layers. In this way, a new nitride-based epitaxial surface layer is formed with hexagonal symmetry and a single in-plane crystal orientation.

  10. DOE-EPSCoR. Exchange interactions in epitaxial intermetallic layered systems

    SciTech Connect

    LeClair, Patrick R.; Gary, Mankey J.

    2015-05-25

    The goal of this research is to develop a fundamental understanding of the exchange interactions in epitaxial intermetallic alloy thin films and multilayers, including films and multilayers of Fe-Pt, Co-Pt and Fe-P-Rh alloys deposited on MgO and Al2O3 substrates. Our prior results have revealed that these materials have a rich variety of ferromagnetic, paramagnetic and antiferromagnetic phases which are sensitive functions of composition, substrate symmetry and layer thickness. Epitaxial antiferromagnetic films of FePt alloys exhibit a different phase diagram than bulk alloys. The antiferromagnetism of these materials has both spin ordering transitions and spin orienting transitions. The objectives include the study of exchange-inversion materials and the interface of these materials with ferromagnets. Our aim is to formulate a complete understanding of the magnetic ordering in these materials, as well as developing an understanding of how the spin structure is modified through contact with a ferromagnetic material at the interface. The ultimate goal is to develop the ability to tune the phase diagram of the materials to produce layered structures with tunable magnetic properties. The alloy systems that we will study have a degree of complexity and richness of magnetic phases that requires the use of the advanced tools offered by the DOE-operated national laboratory facilities, such as neutron and x-ray scattering to measure spin ordering, spin orientations, and element-specific magnetic moments. We plan to contribute to DOE’s mission of producing “Materials by Design” with properties determined by alloy composition and crystal structure. We have developed the methods for fabricating and have performed neutron diffraction experiments on some of the most interesting phases, and our work will serve to answer questions raised about the element-specific magnetizations using the magnetic x-ray dichroism techniques and interface magnetism in layered structures

  11. Physical properties of epitaxial ZrN/MgO(001) layers grown by reactive magnetron sputtering

    SciTech Connect

    Mei, A. B.; Zhang, C.; Sardela, M.; Eckstein, J. N.; Rockett, A.; Howe, B. M.; Hultman, L.; Petrov, I.; Greene, J. E.

    2013-11-15

    Single-crystal ZrN films, 830 nm thick, are grown on MgO(001) at 450 °C by magnetically unbalanced reactive magnetron sputtering. The combination of high-resolution x-ray diffraction reciprocal lattice maps, high-resolution cross-sectional transmission electron microscopy, and selected-area electron diffraction shows that ZrN grows epitaxially on MgO(001) with a cube-on-cube orientational relationship, (001){sub ZrN}‖(001){sub MgO} and [100]{sub ZrN}‖[100]{sub MgO}. The layers are essentially fully relaxed with a lattice parameter of 0.4575 nm, in good agreement with reported results for bulk ZrN crystals. X-ray reflectivity results reveal that the films are completely dense with smooth surfaces (roughness = 1.3 nm, consistent with atomic-force microscopy analyses). Based on temperature-dependent electronic transport measurements, epitaxial ZrN/MgO(001) layers have a room-temperature resistivity ρ{sub 300K} of 12.0 μΩ-cm, a temperature coefficient of resistivity between 100 and 300 K of 5.6 × 10{sup −8}Ω-cm K{sup −1}, a residual resistivity ρ{sub o} below 30 K of 0.78 μΩ-cm (corresponding to a residual resistivity ratio ρ{sub 300Κ}/ρ{sub 15K} = 15), and the layers exhibit a superconducting transition temperature of 10.4 K. The relatively high residual resistivity ratio, combined with long in-plane and out-of-plane x-ray coherence lengths, ξ{sub ‖} = 18 nm and ξ{sub ⊥} = 161 nm, indicates high crystalline quality with low mosaicity. The reflectance of ZrN(001), as determined by variable-angle spectroscopic ellipsometry, decreases slowly from 95% at 1 eV to 90% at 2 eV with a reflectance edge at 3.04 eV. Interband transitions dominate the dielectric response above 2 eV. The ZrN(001) nanoindentation hardness and modulus are 22.7 ± 1.7 and 450 ± 25 GPa.

  12. Layer by layer three-dimensional tissue epitaxy by cell-laden hydrogel droplets.

    PubMed

    Moon, SangJun; Hasan, Syed K; Song, Young S; Xu, Feng; Keles, Hasan Onur; Manzur, Fahim; Mikkilineni, Sohan; Hong, Jong Wook; Nagatomi, Jiro; Haeggstrom, Edward; Khademhosseini, Ali; Demirci, Utkan

    2010-02-01

    The ability to bioengineer three-dimensional (3D) tissues is a potentially powerful approach to treat diverse diseases such as cancer, loss of tissue function, or organ failure. Traditional tissue engineering methods, however, face challenges in fabricating 3D tissue constructs that resemble the native tissue microvasculature and microarchitectures. We have developed a bioprinter that can be used to print 3D patches of smooth muscle cells (5 mm x 5 mm x 81 microm) encapsulated within collagen. Current inkjet printing systems suffer from loss of cell viability and clogging. To overcome these limitations, we developed a system that uses mechanical valves to print high viscosity hydrogel precursors containing cells. The bioprinting platform that we developed enables (i) printing of multilayered 3D cell-laden hydrogel structures (16.2 microm thick per layer) with controlled spatial resolution (proximal axis: 18.0 +/- 7.0 microm and distal axis: 0.5 +/- 4.9 microm), (ii) high-throughput droplet generation (1 s per layer, 160 droplets/s), (iii) cell seeding uniformity (26 +/- 2 cells/mm(2) at 1 million cells/mL, 122 +/- 20 cells/mm(2) at 5 million cells/mL, and 216 +/- 38 cells/mm(2) at 10 million cells/mL), and (iv) long-term viability in culture (>90%, 14 days). This platform to print 3D tissue constructs may be beneficial for regenerative medicine applications by enabling the fabrication of printed replacement tissues. PMID:19586367

  13. Elastic and magnetic properties of epitaxial MnAs layers on GaAs

    NASA Astrophysics Data System (ADS)

    Iikawa, F.; Santos, P. V.; Kästner, M.; Schippan, F.; Däweritz, L.

    2002-05-01

    We have investigated the elasto- and magneto-optical properties of MnAs layers epitaxially grown on (001) GaAs for temperatures around the structural (hexagonal/orthorhombic) and magnetic (ferromagnetic/paramagnetic) phase transition of MnAs at Tc~40 °C. The phase transition is accompanied by a large variation of the MnAs lattice parameter a of ~1%, which induces a strong and anisotropic strain field in the MnAs/GaAs heterostructures. The latter was measured by detecting the optical anisotropy induced on the GaAs substrate by means of polarization-sensitive light transmission measurements. The experimental results show clear evidence for the quasi-uniaxial strain induced on the GaAs substrate during the phase transition, which extends over a temperature range of ~30 °C in the MnAs/GaAs heterostructures. The strain levels are well reproduced by an elastic model for the heterostructures which assumes that the strain is transferred across the MnAs/GaAs interface without relaxation. The elastic properties during the phase transition were compared to the average magnetization probed using a SQUID magnetometer and to the magnetization near the front and the back surfaces of the MnAs films detected using the magneto-optical Kerr effect. The smaller temperature range of the phase transition observed in the magneto-optical Kerr effect measurements indicates a lower stability of the ferromagnetic phase near the surface of the MnAs layers.

  14. Hetero-epitaxy of ε-Ga2O3 layers by MOCVD and ALD

    NASA Astrophysics Data System (ADS)

    Boschi, F.; Bosi, M.; Berzina, T.; Buffagni, E.; Ferrari, C.; Fornari, R.

    2016-06-01

    Growth of gallium oxide thin films was carried out by Metalorganic Chemical Vapor Deposition (MOCVD) at different temperatures. Pure ε-phase epilayers of Ga2O3, with good morphology and structural properties, were obtained, for the first time with this technique, on sapphire at the temperature of 650 °C. XRD analysis performed by high-resolution diffractometry confirmed the good crystallographic quality of the grown layers. At temperatures higher than 700 °C the usual stable β-Ga2O3 phase was obtained. The ε-films were successfully deposited also on (0001)-oriented GaN and (111)- and (001)-oriented 3C-SiC templates, provided that the appropriate temperature was chosen. This indicates that the temperature, rather than substrate structure, is the growth parameter which decides what phase actually forms. The growth proceeds via coalescence of hexagonal islands and is favored when a substrate with an in-plane hexagonal arrangement of the atoms is employed. By applying Atomic Layer Deposition (ALD), epitaxial growth of the ε-phase was achieved at lower temperature, while the overall uniformity resulted improved, even on large sapphire substrates.

  15. Observation of natural superlattice in AlXGa1-XAs layers grown by metalorganic vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Pradhan, A.; Maitra, T.; Mukherjee, S.; Mukherjee, S.; Nayak, A.; Satpati, B.; Bhunia, S.

    2016-05-01

    Atomic Cu-Pt type ordering in monolayer scale is well known in Ga0.5 In0.5 P epitaxial layers leading to change in its bandgap. Despite wide scale use of AlxGa1-xAs (0epitaxial layers. Clear evidence of such ordering was first noticed in the barrier layers of GaAs/Al0.3Ga0.7As quantum well structures. Further investigation on bulk epitaxial growth of AlxGa1-xAs layer with different composition (x=0.2) has also confirmed existence of such structures. We have probed the sample using high resolution Transmission Electron Microscopy coupled with x-ray rocking curve (XRC) and reflectivity (XRR) measurements. Sharp superlattice peaks around (004) substrate Bragg peak as well as around (002) forbidden peak in XRC have been observed. Similar peaks are present in XRR also. We have presented detailed analysis of X-ray diffraction data with the help of kinematical diffraction theory here. The stability of the superlattice structures has been further investigated by annealing the sample at different temperatures.

  16. Spin transport in epitaxial magnetic manganite/ruthenate heterostructures with an LaMnO{sub 3} layer

    SciTech Connect

    Petrzhik, A. M. Ovsyannikov, G. A.; Shadrin, A. V.; Khaidukov, Yu. N.; Mustafa, L.

    2014-12-15

    Epitaxial La{sub 0.7}Sr{sub 0.3}MnO{sub 3}/LaMnO{sub 3}/SrRuO{sub 3} (LSMO/LMO/SRO) heterostructures with an LMO layer 0–35 nm thick are grown by laser ablation on an NdGaO{sub 3} substrate at a high temperature. X-ray diffraction and transmission electron microscopy demonstrate sharp interfaces and epitaxial growth of the LSMO and SRO layers in the heterostructures at an LMO layer thickness of 0–35 nm. SQUID measurements of the magnetic moment of the heterostructures with an LMO layer and the data obtained with reflectometry of polarized neutrons show that the manganite LMO layer is a ferromagnet at a temperature below 150 K and strongly affects the magnetic moment of the heterostructures at low temperatures. The magnetoresistance of the mesostructure created from the heterostructure using lithography and ion etching decreases with increasing LMO layer thickness and weakly depends on the direction of an applied magnetic field. If the LMP layer is absent, a negative magnetoresistance is detected; it is likely to be caused by a negative magnetization of the SRO layer.

  17. Effects of boron dopants of Si (001) substrates on formation of Ge layers by sputter epitaxy method

    NASA Astrophysics Data System (ADS)

    Tsukamoto, Takahiro; Hirose, Nobumitsu; Kasamatsu, Akifumi; Mimura, Takashi; Matsui, Toshiaki; Suda, Yoshiyuki

    2013-10-01

    The formation of Ge layers on boron-doped Si (001) substrates by our sputter epitaxy method has been investigated. The surface morphology of Ge layers grown on Si substrates depends on the substrate resistance, and flat Ge layers are obtained on Si substrates with 0.015 Ω cm resistivity. Highly boron-doped Si substrates cause a transition in the dislocation structure from complex dislocations with 60° dislocation glide planes to 90° pure-edge dislocations, resulting in the formation of flat Ge layers. Furthermore, we have found that the surface morphology of the Ge layers improves with increasing Ge layer thickness. Ge atoms migrating on the deposited Ge layers tend to position themselves at the reactive sites, where the reactivity is related to the number of bonding contacts between the Ge atom and the surface. This modifies the surface morphology, resulting in a flatter surface. Boron dopants together with the sputter epitaxy method effectively suppress the growth of Ge islands and result in the formation of flat Ge layers.

  18. Effects of boron dopants of Si (001) substrates on formation of Ge layers by sputter epitaxy method

    SciTech Connect

    Tsukamoto, Takahiro; Suda, Yoshiyuki; Hirose, Nobumitsu; Kasamatsu, Akifumi; Mimura, Takashi; Matsui, Toshiaki

    2013-10-21

    The formation of Ge layers on boron-doped Si (001) substrates by our sputter epitaxy method has been investigated. The surface morphology of Ge layers grown on Si substrates depends on the substrate resistance, and flat Ge layers are obtained on Si substrates with 0.015 Ω cm resistivity. Highly boron-doped Si substrates cause a transition in the dislocation structure from complex dislocations with 60° dislocation glide planes to 90° pure-edge dislocations, resulting in the formation of flat Ge layers. Furthermore, we have found that the surface morphology of the Ge layers improves with increasing Ge layer thickness. Ge atoms migrating on the deposited Ge layers tend to position themselves at the reactive sites, where the reactivity is related to the number of bonding contacts between the Ge atom and the surface. This modifies the surface morphology, resulting in a flatter surface. Boron dopants together with the sputter epitaxy method effectively suppress the growth of Ge islands and result in the formation of flat Ge layers.

  19. Layer-Controlled Chemical Vapor Deposition Growth of MoS2 Vertical Heterostructures via van der Waals Epitaxy.

    PubMed

    Samad, Leith; Bladow, Sage M; Ding, Qi; Zhuo, Junqiao; Jacobberger, Robert M; Arnold, Michael S; Jin, Song

    2016-07-26

    The fascinating semiconducting and optical properties of monolayer and few-layer transition metal dichalcogenides, as exemplified by MoS2, have made them promising candidates for optoelectronic applications. Controllable growth of heterostructures based on these layered materials is critical for their successful device applications. Here, we report a direct low temperature chemical vapor deposition (CVD) synthesis of MoS2 monolayer/multilayer vertical heterostructures with layer-controlled growth on a variety of layered materials (SnS2, TaS2, and graphene) via van der Waals epitaxy. Through precise control of the partial pressures of the MoCl5 and elemental sulfur precursors, reaction temperatures, and careful tracking of the ambient humidity, we have successfully and reproducibly grown MoS2 vertical heterostructures from 1 to 6 layers over a large area. The monolayer MoS2 heterostructure was verified using cross-sectional high resolution transmission electron microscopy (HRTEM) while Raman and photoluminescence spectroscopy confirmed the layer-controlled MoS2 growth and heterostructure electronic interactions. Raman, photoluminescence, and energy dispersive X-ray spectroscopy (EDS) mappings verified the uniform coverage of the MoS2 layers. This reaction provides an ideal method for the scalable layer-controlled growth of transition metal dichalcogenide heterostructures via van der Waals epitaxy for a variety of optoelectronic applications. PMID:27373305

  20. Heavily boron-doped Si layers grown below 700 C by molecular beam epitaxy using a HBO2 source

    NASA Technical Reports Server (NTRS)

    Lin, T. L.; Fathauer, R. W.; Grunthaner, P. J.

    1989-01-01

    Boron doping in Si layers grown by molecular beam epitaxy (MBE) at 500-700 C using an HBO2 source has been studied. The maximum boron concentration without detectable oxygen incorporation for a given substrate temperature and Si growth rate has been determined using secondary-ion mass spectrometry analysis. Boron present in the Si MBE layers grown at 550-700 C was found to be electrically active, independent of the amount of oxygen incorporation. By reducing the Si growth rate, highly boron-doped layers have been grown at 600 C without detectable oxygen incorporation.

  1. Study of photoresponsivity in optoelectronic devices based on single crystal β-Ga2O3 epitaxial layers

    NASA Astrophysics Data System (ADS)

    Horng, Ray-Hua; Ravadgar, Parvaneh

    2013-03-01

    Single crystal β-Ga2O3 epitaxial layers have been prepared on c-axis (0001) sapphire substrates using metalorganic chemical vapor deposition technique at relatively low temperature. Post-annealing of β-Ga2O3 single crystals up to 800 °C does not affect the crystallinity, explored by x-ray diffraction, showing that β-Ga2O3 epitaxial layers are highly (-201) oriented. Metal-semiconductor-metal devices are fabricated on single crystals to study their photoresponsivity. A significant improvement in performance of post annealed-based devices is observed, attributed to point defect reduction. Annealing of as-grown samples results to a significant decrease in both oxygen and gallium vacancies, which are sources of current leakage.

  2. Electron beam evaporated carbon doping of InGaAs layers grown by gas source molecular beam epitaxy

    SciTech Connect

    Salokatve, A.; Toivonen, M.; Asonen, H.; Pessa, M.; Likonen, J.

    1996-12-31

    The authors have studied carbon doping of GaInAs grown by gas-source molecular beam epitaxy. Graphite was used as a source material for carbon evaporation. GaInAs was studied due to its importance as a base layer in InP-based heterojunction bipolar transistors. They show that useful p-type acceptor concentrations can be achieved by evaporation from graphite source for GaInAs grown by gas-source molecular beam epitaxy. Secondary ion mass spectroscopy and Van der Pauw Hall measurements were used to characterize the carbon and net acceptor concentrations of their GaInAs layers. The effect of rapid thermal annealing on acceptor concentrations and Hall mobilities was also studied.

  3. Selenium distribution in the epitaxial layers of PbTe/sub 1-z/Se/sub z/ solid solutions

    SciTech Connect

    Yakimchuk, D.Yu.; Tsveibak, I.Ya.; Sokolov, I.A.; Krapukhin, V.V.

    1987-03-01

    The authors have studied the Se distribution over the thickness of epitaxial layers of PbTe/sub 1-z/Se/sub z/ solid solutions that were obtained on PbTe (100) substrates by the method of forced cooling of solutions in melts in lead in the range 540-490/sup 0/C. The Se concentration has been found to have a considerable gradient. Theoretical analysis has shown that the Se distribution coefficient exceeds the values that are known from the literature and the molar fraction of PbSe in the liquid phase at the onset of the growth of the epitaxial layer is lower than the initial value; this indicates that the substrate dissolves when it comes into contact with the solution in a melt.

  4. Real structure of the ZnO epitaxial films on (0001) leucosapphire substrates coated by ultrathin gold layers

    NASA Astrophysics Data System (ADS)

    Muslimov, A. E.; Butashin, A. V.; Kolymagin, A. B.; Vasilyev, A. L.; Kanevsky, V. M.

    2016-01-01

    The real structure of ZnO films formed by magnetron sputtering on (0001) leucosapphire substrates coated by an ultrathin (less than 0.7 nm) Au buffer layer has been studied by high-resolution microscopy. It is shown that modification of the leucosapphire substrate surface by depositing ultrathin Au layers does not lead to the formation of Au clusters at the film-substrate interface but significantly improves the structural quality of ZnO epitaxial films. It is demonstrated that the simplicity and scalability of the technique used to modify the substrate surface in combination with a high (above 2 nm/s) film growth rate under magnetron sputtering make it possible to obtain high-quality (0001) ZnO epitaxial films with an area of 5-6 cm2.

  5. Epitaxial growth of zinc oxide by the method of atomic layer deposition on SiC/Si substrates

    NASA Astrophysics Data System (ADS)

    Kukushkin, S. A.; Osipov, A. V.; Romanychev, A. I.

    2016-07-01

    For the first time, zinc oxide epitaxial films on silicon were grown by the method of atomic layer deposition at a temperature T = 250°C. In order to avoid a chemical reaction between silicon and zinc oxide (at the growth temperature, the rate constant of the reaction is of the order of 1022), a high-quality silicon carbide buffer layer with a thickness of ~50 nm was preliminarily synthesized by the chemical substitution of atoms on the silicon surface. The zinc oxide films were grown on n- and p-type Si(100) wafers. The ellipsometric, Raman, electron diffraction, and trace element analyses showed that the ZnO films are epitaxial.

  6. Tellurium-Assisted Epitaxial Growth of Large-Area, Highly Crystalline ReS2 Atomic Layers on Mica Substrate.

    PubMed

    Cui, Fangfang; Wang, Cong; Li, Xiaobo; Wang, Gang; Liu, Kaiqiang; Yang, Zhou; Feng, Qingliang; Liang, Xing; Zhang, Zhongyue; Liu, Shengzhong; Lei, Zhibin; Liu, Zonghuai; Xu, Hua; Zhang, Jin

    2016-07-01

    Anisotropic 2D layered material rhenium disulfide (ReS2 ) with high crystal quality and uniform monolayer thickness is synthesized by using tellurium-assisted epitaxial growth on mica substrate. Benefit from the lower eutectic temperature of rhenium-tellurium binary eutectic, ReS2 can grow from rhenium (melting point at 3180 °C) and sulfur precursors in the temperature range of 460-900 °C with high efficiency. PMID:27121002

  7. Positron annihilation studies of defects in molecular beam epitaxy grown III-V layers

    SciTech Connect

    Umlor, M.T.; Keeble, D.J.; Asoka-Kumar, P.; Lynn, K.G.; Cooke, P.W.

    1994-08-01

    A summary of recent positron annihilation experiments on molecular beam epitaxy (MBE) grown III-V layers is Presented. Variable energy positron beam measurements on Al{sub 0.32}Ga{sub 0.68}As undoped and Si doped have been completed. Positron trapping at a open volume defect in Al{sub 0.32}Ga{sub 0.68}:Si for temperatures from 300 to 25 K in the dark was observed. The positron trap was lost after 1.3 eV illumination at 25K. These results indicate an open volume defect is associated with the local structure of the deep donor state of the DX center. Stability of MBE GaAs to thermal annealing war, investigated over the temperature range of 230 to 700{degrees}C, Proximity wafer furnace anneals in flowing argon were used, Samples grown above 450{degrees}C were shown to be stable but for sample below this temperature an anneal induced vacancy related defect was produced for anneals between 400 and 500{degrees}C. The nature of the defect was shown to be different for material grown at 350 and 230{degrees}C. Activation energies of 2.5 eV to 2.3 eV were obtained from isochronal anneal experiments for samples grown at 350 and 230{degrees}C, respectively.

  8. Scanning tunneling microscopic analysis of Cu(In,Ga)Se{sub 2} epitaxial layers

    SciTech Connect

    Mayer, Marie A.; Hebert, Damon; Rockett, Angus A.; Ruppalt, Laura B.; Lyding, Joseph

    2010-02-15

    Scanning tunneling microscopy (STM) measurements have been made on single-crystal epitaxial layers of CuInSe{sub 2} grown on GaAs substrates. Results were obtained for as-grown, air-exposed, and cleaned surfaces; in situ cleaved surfaces; surfaces sputtered and annealed in the STM system; and samples prepared by a light chemical etch. Conventional constant-current topographs, current-voltage curves, and current imaging tunneling spectroscopy (CITS) scans were obtained. Topographic images show that the surfaces appear rough on the atomic scale and often exhibit regular features consistent with a previously proposed surface ad-dimer reconstruction. CITS scans show a spatially varying energy gap consistent with band-edge fluctuations on a scale of a few atomic spacings. Energy variations were observed in both band edges. Although quantitative description of the magnitude of these fluctuations is difficult, the fluctuations on the atomic scale appear much larger than observed by methods such as photoluminescence, which average over larger volumes.

  9. Electrochemical removal of hydrogen atoms in Mg-doped GaN epitaxial layers

    SciTech Connect

    Lee, June Key E-mail: hskim7@jbnu.ac.kr; Hyeon, Gil Yong; Tawfik, Wael Z.; Choi, Hee Seok; Ryu, Sang-Wan; Jeong, Tak; Jung, Eunjin; Kim, Hyunsoo E-mail: hskim7@jbnu.ac.kr

    2015-05-14

    Hydrogen atoms inside of an Mg-doped GaN epitaxial layer were effectively removed by the electrochemical potentiostatic activation (EPA) method. The role of hydrogen was investigated in terms of the device performance of light-emitting diodes (LEDs). The effect of the main process parameters for EPA such as solution type, voltage, and time was studied and optimized for application to LED fabrication. In optimized conditions, the light output of 385-nm LEDs was improved by about 26% at 30 mA, which was caused by the reduction of the hydrogen concentration by ∼35%. Further removal of hydrogen seems to be involved in the breaking of Ga-H bonds that passivate the nitrogen vacancies. An EPA process with high voltage breaks not only Mg-H bonds that generate hole carriers but also Ga-H bonds that generate electron carriers, thus causing compensation that impedes the practical increase of hole concentration, regardless of the drastic removal of hydrogen atoms. A decrease in hydrogen concentration affects the current-voltage characteristics, reducing the reverse current by about one order and altering the forward current behavior in the low voltage region.

  10. Physical verification and manufacturing of contact/via layers using grapho-epitaxy DSA processes

    NASA Astrophysics Data System (ADS)

    Torres, J. Andres; Sakajiri, Kyohei; Fryer, David; Granik, Yuri; Ma, Yuansheng; Krasnova, Polina; Fenger, Germain; Nagahara, Seiji; Kawakami, Shinichiro; Rathsack, Benjamen; Khaira, Gurdaman; de Pablo, Juan; Ryckaert, Julien

    2014-03-01

    This paper extends the state of the art by describing the practical material's challenges, as well as approaches to minimize their impact in the manufacture of contact/via layers using a grapho-epitaxy directed self assembly (DSA) process. Three full designs have been analyzed from the point of view of layout constructs. A construct is an atomic and repetitive section of the layout which can be analyzed in isolation. Results indicate that DSA's main benefit is its ability to be resilient to the shape of the guiding pattern across process window. The results suggest that directed self assembly can still be guaranteed even with high distortion of the guiding patterns when the guiding patterns have been designed properly for the target process. Focusing on a 14nm process based on 193i lithography, we present evidence of the need of DSA compliance methods and mask synthesis tools which consider pattern dependencies of adjacent structures a few microns away. Finally, an outlook as to the guidelines and challenges to DSA copolymer mixtures and process are discussed highlighting the benefits of mixtures of homo polymer and diblock copolymer to reduce the number of defects of arbitrarily placed hole configurations.

  11. Energetics and atomic mechanisms of dislocation nucleation in strained epitaxial layers

    NASA Astrophysics Data System (ADS)

    Trushin, O.; Granato, E.; Ying, S. C.; Salo, P.; Ala-Nissila, T.

    2003-10-01

    We numerically study the energetics and atomic mechanisms of misfit dislocation nucleation and stress relaxation in a two-dimensional atomistic model of strained epitaxial layers on a substrate with lattice misfit. Relaxation processes from coherent to incoherent states for different transition paths are studied using interatomic potentials of Lennard-Jones type and a systematic saddle-point and transition-path search method. The method is based on a combination of a repulsive potential minimization and the nudged elastic band method. For a final state with a single misfit dislocation, the minimum-energy path and the corresponding activation barrier are obtained for different misfits and interatomic potentials. We find that the energy barrier decreases strongly with misfit. In contrast to continuous elastic theory, a strong tensile-compressive asymmetry is observed. This asymmetry can be understood as a manifestation of the asymmetry between repulsive and attractive branches of the pair potential, and it is found to depend sensitively on the form of the potential.

  12. Electrochemical removal of hydrogen atoms in Mg-doped GaN epitaxial layers

    NASA Astrophysics Data System (ADS)

    Lee, June Key; Hyeon, Gil Yong; Tawfik, Wael Z.; Choi, Hee Seok; Ryu, Sang-Wan; Jeong, Tak; Jung, Eunjin; Kim, Hyunsoo

    2015-05-01

    Hydrogen atoms inside of an Mg-doped GaN epitaxial layer were effectively removed by the electrochemical potentiostatic activation (EPA) method. The role of hydrogen was investigated in terms of the device performance of light-emitting diodes (LEDs). The effect of the main process parameters for EPA such as solution type, voltage, and time was studied and optimized for application to LED fabrication. In optimized conditions, the light output of 385-nm LEDs was improved by about 26% at 30 mA, which was caused by the reduction of the hydrogen concentration by ˜35%. Further removal of hydrogen seems to be involved in the breaking of Ga-H bonds that passivate the nitrogen vacancies. An EPA process with high voltage breaks not only Mg-H bonds that generate hole carriers but also Ga-H bonds that generate electron carriers, thus causing compensation that impedes the practical increase of hole concentration, regardless of the drastic removal of hydrogen atoms. A decrease in hydrogen concentration affects the current-voltage characteristics, reducing the reverse current by about one order and altering the forward current behavior in the low voltage region.

  13. Epitaxial NbN/AlN/NbN tunnel junctions on Si substrates with TiN buffer layers

    NASA Astrophysics Data System (ADS)

    Sun, Rui; Makise, Kazumasa; Zhang, Lu; Terai, Hirotaka; Wang, Zhen

    2016-06-01

    We have developed epitaxial NbN/AlN/NbN tunnel junctions on Si (100) substrates with a TiN buffer layer. A 50-nm-thick (200)-oriented TiN thin film was introduced as the buffer layer for epitaxial growth of NbN/AlN/NbN trilayers on Si substrates. The fabricated NbN/AlN/NbN junctions demonstrated excellent tunneling properties with a high gap voltage of 5.5 mV, a large IcRN product of 3.8 mV, a sharp quasiparticle current rise with a ΔVg of 0.4 mV, and a small subgap leakage current. The junction quality factor Rsg/RN was about 23 for the junction with a Jc of 47 A/cm2 and was about 6 for the junction with a Jc of 3.0 kA/cm2. X-ray diffraction and transmission electron microscopy observations showed that the NbN/AlN/NbN trilayers were grown epitaxially on the (200)-orientated TiN buffer layer and had a highly crystalline structure with the (200) orientation.

  14. Room-temperature ferromagneticlike behavior in Mn-implanted and postannealed InAs layers deposited by molecular beam epitaxy

    SciTech Connect

    Gonzalez-Arrabal, R.; Gonzalez, Y.; Gonzalez, L.; Martin-Gonzalez, M. S.; Munnik, F.

    2009-04-01

    We report on the magnetic and structural properties of Ar- and Mn-implanted InAs epitaxial films grown on GaAs (100) by molecular beam epitaxy and the effect of rapid thermal annealing (RTA) for 30 s at 750 deg. C. Channeling particle induced x-ray emission (PIXE) experiments reveal that after Mn implantation almost all Mn atoms are substitutional in the In site of the InAs lattice, like in a diluted magnetic semiconductor. All of these samples show diamagnetic behavior. However, after RTA treatment the Mn-InAs films exhibit room-temperature magnetism. According to PIXE measurements the Mn atoms are no longer substitutional. When the same set of experiments was performed with Ar as implantation ion, all of the layers present diamagnetism without exception. This indicates that the appearance of room-temperature ferromagneticlike behavior in the Mn-InAs-RTA layer is not related to lattice disorder produced during implantation but to a Mn reaction produced after a short thermal treatment. X-ray diffraction patterns and Rutherford backscattering measurements evidence the segregation of an oxygen-deficient MnO{sub 2} phase (nominally MnO{sub 1.94}) in the Mn-InAs-RTA epitaxial layers which might be the origin of the room-temperature ferromagneticlike response observed.

  15. Atomic Layer Epitaxy of h-BN(0001) Multilayers on Co(0001) and Molecular Beam Epitaxy Growth of Graphene on h-BN(0001)/Co(0001).

    PubMed

    Driver, M Sky; Beatty, John D; Olanipekun, Opeyemi; Reid, Kimberly; Rath, Ashutosh; Voyles, Paul M; Kelber, Jeffry A

    2016-03-22

    The direct growth of hexagonal boron nitride (h-BN) by industrially scalable methods is of broad interest for spintronic and nanoelectronic device applications. Such applications often require atomically precise control of film thickness and azimuthal registry between layers and substrate. We report the formation, by atomic layer epitaxy (ALE), of multilayer h-BN(0001) films (up to 7 monolayers) on Co(0001). The ALE process employs BCl3/NH3 cycles at 600 K substrate temperature. X-ray photoelectron spectroscopy (XPS) and low energy electron diffraction (LEED) data show that this process yields an increase in h-BN average film thickness linearly proportional to the number of BCl3/NH3 cycles, with BN layers in azimuthal registry with each other and with the Co(0001) substrate. LEED diffraction spot profile data indicate an average BN domain size of at least 1900 Å. Optical microscopy data indicate the presence of some domains as large as ∼20 μm. Transmission electron microscopy (TEM) and ambient exposure studies demonstrate macroscopic and microscopic continuity of the h-BN film, with the h-BN film highly conformal to the Co substrate. Photoemission data show that the h-BN(0001) film is p-type, with band bending near the Co/h-BN interface. Growth of graphene by molecular beam epitaxy (MBE) is observed on the surface of multilayer h-BN(0001) at temperatures of 800 K. LEED data indicate azimuthal graphene alignment with the h-BN and Co(0001) lattices, with domain size similar to BN. The evidence of multilayer BN and graphene azimuthal alignment with the lattice of the Co(0001) substrate demonstrates that this procedure is suitable for scalable production of heterojunctions for spintronic applications. PMID:26940024

  16. Self-assembled Multilayers of Silica Nanospheres for Defect Reduction in Non- and Semipolar Gallium Nitride Epitaxial Layers

    PubMed Central

    2015-01-01

    Non- and semipolar GaN have great potential to improve the efficiency of light emitting devices due to much reduced internal electric fields. However, heteroepitaxial GaN growth in these crystal orientations suffers from very high dislocation and stacking faults densities. Here, we report a facile method to obtain low defect density non- and semipolar heteroepitaxial GaN via selective area epitaxy using self-assembled multilayers of silica nanospheres (MSN). Nonpolar (11–20) and semipolar (11–22) GaN layers with high crystal quality have been achieved by epitaxial integration of the MSN and a simple one-step overgrowth process, by which both dislocation and basal plane stacking fault densities can be significantly reduced. The underlying defect reduction mechanisms include epitaxial growth through the MSN covered template, island nucleation via nanogaps in the MSN, and lateral overgrowth and coalescence above the MSN. InGaN/GaN multiple quantum wells structures grown on a nonpolar GaN/MSN template show more than 30-fold increase in the luminescence intensity compared to a control sample without the MSN. This self-assembled MSN technique provides a new platform for epitaxial growth of nitride semiconductors and offers unique opportunities for improving the material quality of GaN grown on other orientations and foreign substrates or heteroepitaxial growth of other lattice-mismatched materials. PMID:27065755

  17. Vertically aligned GaAs nanowires on graphite and few-layer graphene: generic model and epitaxial growth.

    PubMed

    Munshi, A Mazid; Dheeraj, Dasa L; Fauske, Vidar T; Kim, Dong-Chul; van Helvoort, Antonius T J; Fimland, Bjørn-Ove; Weman, Helge

    2012-09-12

    By utilizing the reduced contact area of nanowires, we show that epitaxial growth of a broad range of semiconductors on graphene can in principle be achieved. A generic atomic model is presented which describes the epitaxial growth configurations applicable to all conventional semiconductor materials. The model is experimentally verified by demonstrating the growth of vertically aligned GaAs nanowires on graphite and few-layer graphene by the self-catalyzed vapor-liquid-solid technique using molecular beam epitaxy. A two-temperature growth strategy was used to increase the nanowire density. Due to the self-catalyzed growth technique used, the nanowires were found to have a regular hexagonal cross-sectional shape, and are uniform in length and diameter. Electron microscopy studies reveal an epitaxial relationship of the grown nanowires with the underlying graphitic substrates. Two relative orientations of the nanowire side-facets were observed, which is well explained by the proposed atomic model. A prototype of a single GaAs nanowire photodetector demonstrates a high-quality material. With GaAs being a model system, as well as a very useful material for various optoelectronic applications, we anticipate this particular GaAs nanowire/graphene hybrid to be promising for flexible and low-cost solar cells. PMID:22889019

  18. Interface structural defects and photoluminescence properties of epitaxial GaN and AlGaN/GaN layers grown on sapphire

    SciTech Connect

    Klad'ko, V. P.; Chornen'kii, S. V.; Naumov, A. V. Komarov, A. V.; Tacano, M.; Sveshnikov, Yu. N.; Vitusevich, S. A.; Belyaev, A. E.

    2006-09-15

    Overall characterization of the GaN and AlGaN/GaN epitaxial layers by X-ray diffractometry and optical spectral analysis is carried out. The layers are grown by metalloorganic gas-phase epitaxy on (0001)-oriented single crystal sapphire wafers. The components of strains and the density of dislocations are determined. The effects of strains and dislocations on the photoluminescence intensity and spectra are studied. The results allow better understanding of the nature and mechanisms of the formation of defects in the epitaxial AlGaN/GaN heterostructures.

  19. Layer by layer growth of BaTiO 3 thin films with extremely smooth surfaces by laser molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Wang, H. S.; Ma, K.; Cui, D. F.; Peng, Z. Q.; Zhou, Y. L.; Lu, H. B.; Chen, Z. H.; Li, L.; Yang, G. Z.

    1997-05-01

    Using pure ozone-assisted laser molecular beam epitaxy, we have grown c-axis-oriented single crystal BaTiO 3 thin films on SrTiO 3 substrates at temperatures ( Ts) of 400-750°C and under ambient gas pressures of 5 × 10 -5 to 1 × 10 -1 Pa, respectively. Stripy reflection high-energy electron diffraction (RHEED) patterns and regular RHEED intensity oscillations reveal the smooth surface and layer-by-layer epitaxial growth of the films. Scanning electron microscopy analysis shows that the films are free of pinholes, grain boundaries and outgrowths on the surface. In addition, we found a strong dependence of the film lattice constant c on Ts, which might be related to the strain in the film.

  20. Stress reduction in epitaxial GaN films on Si using cubic SiC as intermediate layers

    NASA Astrophysics Data System (ADS)

    Komiyama, Jun; Abe, Yoshihisa; Suzuki, Shunichi; Nakanishi, Hideo

    2006-08-01

    Stress in the epitaxial films of GaN on Si is reduced by using SiC as intermediate layers. The crystalline films of cubic SiC (0-1μm), thin AlN (50nm), and GaN (1-3μm) were prepared on 3in. (1 1 1) Si substrates—stacked in the order of GaN /AlN/SiC/Si—by metalorganic vapor-phase epitaxy. It is revealed by Raman spectroscopy that the tensile stress in GaN is reduced to half (reduction of about 300MPa) for GaN on Si with SiC intermediate layers compared with GaN on Si without SiC intermediate layers. Because of stress reduction, crack-free GaN on Si with a thickness of 2μm was obtained by using SiC intermediate layers. Cracking was minimized even on thicker GaN on Si (3μm thick) with SiC intermediate layers. The SiC intermediate layers are promising for the realization of nitride based electronic devices on Si.

  1. Development of Production PVD-AIN Buffer Layer System and Processes to Reduce Epitaxy Costs and Increase LED Efficiency

    SciTech Connect

    Cerio, Frank

    2013-09-14

    The DOE has set aggressive goals for solid state lighting (SSL) adoption, which require manufacturing and quality improvements for virtually all process steps leading to an LED luminaire product. The goals pertinent to this proposed project are to reduce the cost and improve the quality of the epitaxial growth processes used to build LED structures. The objectives outlined in this proposal focus on achieving cost reduction and performance improvements over state-of-the-art, using technologies that are low in cost and amenable to high efficiency manufacturing. The objectives of the outlined proposal focus on cost reductions in epitaxial growth by reducing epitaxy layer thickness and hetero-epitaxial strain, and by enabling the use of larger, less expensive silicon substrates and would be accomplished through the introduction of a high productivity reactive sputtering system and an effective sputtered aluminum-nitride (AlN) buffer/nucleation layer process. Success of the proposed project could enable efficient adoption of GaN on-silicon (GaN/Si) epitaxial technology on 150mm silicon substrates. The reduction in epitaxy cost per cm{sup 2} using 150mm GaN-on-Si technology derives from (1) a reduction in cost of ownership and increase in throughput for the buffer deposition process via the elimination of MOCVD buffer layers and other throughput and CoO enhancements, (2) improvement in brightness through reductions in defect density, (3) reduction in substrate cost through the replacement of sapphire with silicon, and (4) reduction in non-ESD yield loss through reductions in wafer bow and temperature variation. The adoption of 150mm GaN/Si processing will also facilitate significant cost reductions in subsequent wafer fabrication manufacturing costs. There were three phases to this project. These three phases overlap in order to aggressively facilitate a commercially available production GaN/Si capability. In Phase I of the project, the repeatability of the performance

  2. Tuning of strain and surface roughness of porous silicon layers for higher-quality seeds for epitaxial growth

    PubMed Central

    2014-01-01

    Sintered porous silicon is a well-known seed for homo-epitaxy that enables fabricating transferrable monocrystalline foils. The crystalline quality of these foils depends on the surface roughness and the strain of this porous seed, which should both be minimized. In order to provide guidelines for an optimum foil growth, we present a systematic investigation of the impact of the thickness of this seed and of its sintering time prior to epitaxial growth on strain and surface roughness. Strain and surface roughness were monitored in monolayers and double layers with different porosities as a function of seed thickness and of sintering time by high-resolution X-ray diffraction and profilometry, respectively. Unexpectedly, we found that strain in double and monolayers evolves in opposite ways with respect to layer thickness. This suggests that an interaction between layers in multiple stacks is to be considered. We also found that if higher seed thickness and longer annealing time are to be preferred to minimize the strain in double layers, the opposite is required to achieve smoother layers. The impact of these two parameters may be explained by considering the morphological evolution of the pores upon sintering and, in particular, the disappearance of interconnections between the porous seed and the bulk as well as the enlargement of pores near the surface. An optimum epitaxial growth hence calls for a trade-off in seed thickness and annealing time, between minimum-strained layers and rougher surfaces. PACS codes 81.40.-z Treatment of materials and its effects on microstructure, nanostructure, and properties; 81.05.Rm Porous materials; granular materials; 82.80.Ej X-ray, Mössbauer and other γ-ray spectroscopic analysis methods PMID:25136277

  3. Epitaxial growth of AlN and Al 0.5Ga 0.5N layers on aluminum nitride substrates

    NASA Astrophysics Data System (ADS)

    Schowalter, L. J.; Rojo, J. C.; Slack, G. A.; Shusterman, Y.; Wang, R.; Bhat, I.; Arunmozhi, G.

    2000-04-01

    High-quality epitaxial AlN and Al xGa 1- xN layers have been grown by organo-metallic vapor-phase epitaxy (OMVPE) on single-crystal AlN substrates. Here we report the characterization of these layers on a-face substrates using Rutherford backscattering/ion channeling spectroscopy (RBS), atomic force microscopy (AFM), double-crystal X-ray diffraction (XRD), and preliminary electrical results. Ion channeling along the [ 1 1 2¯ 0 ] axis gave a minimum yield of 1.5% for an AlN layer and 2.2% for an Al 0.5Ga 0.5N, indicating excellent crystal quality. A resistivity of 20 Ω cm and a mobility of 20 cm 2/V s was measured in a Si-doped, 1 μm-thick, epitaxial Al 0.5Ga 0.5N grown epitaxially on the AlN substrates.

  4. Realization of high quality epitaxial current- perpendicular-to-plane giant magnetoresistive pseudo spin-valves on Si(001) wafer using NiAl buffer layer

    NASA Astrophysics Data System (ADS)

    Chen, Jiamin; Liu, J.; Sakuraba, Y.; Sukegawa, H.; Li, S.; Hono, K.

    2016-05-01

    In this letter, we report a NiAl buffer layer as a template for the integration of epitaxial current-perpendicular-plane-giant magnetoresistive (CPP-GMR) devices on a Si(001) single crystalline substrate. By depositing NiAl on a Si wafer at an elevated temperature of 500 °C, a smooth and epitaxial B2-type NiAl(001) layer was obtained. The surface roughness was further improved by depositing Ag on the NiAl layer and applying subsequent annealing process. The epitaxial CPP-GMR devices grown on the buffered Si(001) substrate present a large magnetoresistive output comparable with that of the devices grown on an MgO(001) substrate, demonstrating the possibility of epitaxial spintronic devices with a NiAl templated Si wafer for practical applications.

  5. Structural Properties of Alternate Monatomic Layered [Fe/Co]n Epitaxial Films on MgO Substrate

    NASA Astrophysics Data System (ADS)

    Chu, In Chang; Saki, Yoshinobu; Kawasaki, Shohei; Doi, Masaaki; Sahashi, Masashi

    2008-06-01

    Body-centered-cubic (bcc) Fe50Co50 material is reported to show a high bulk spin scattering coefficient on current perpendicular to plane-giant magneto-resistance (CPP-GMR) system. But the origin of that phenomenon does not make sure yet. We prepared artificially alternate monatomic layered (AML) [Fe/Co] 41 MLs epitaxial films (Ts: 75, 250 °C) by monatomic deposition method and investigated the topology of AML [Fe/Co]n epitaxial films on MgO substrate with different orientation (001), (011) by the scanning tunnel microscopy (STM) and reflection high energy electron diffraction (RHEED), which we could confirm Frank-van der Merwe (FM) growth mode for AML [Fe/Co]n on MgO(001) and Volmer-Weber (VW) growth mode for that on Mg(011). The roughness of surface, Ra (0.20 nm) of AML [Fe/Co] 41 MLs epitaxial film grown at 75 °C on MgO(001) is smaller than that (0.46 nm) of AML [Fe/Co] grown at 250 °C on MgO(001), which has the large terraces of over 50 nm (Ra: 0.17 nm), even though there are some valleys between large terraces. Moreover we confirmed the structural properties of trilayered epitaxial films with AML [Fe/Co]n (Ra: 0.18 nm) and Fe50Co50 alloy epitaxial film on Au electrode by RHEED before confirming the characteristics of CPP-GMR devices.

  6. Molecular beam epitaxy growth of high quality p-doped SnS van der Waals epitaxy on a graphene buffer layer

    SciTech Connect

    Wang, W.; Leung, K. K.; Fong, W. K.; Wang, S. F.; Surya, C.; Hui, Y. Y.; Lau, S. P.; Chen, Z.; Shi, L. J.; Cao, C. B.

    2012-05-01

    We report on the systematic investigation of optoelectronic properties of tin (IV) sulfide (SnS) van der Waals epitaxies (vdWEs) grown by molecular beam epitaxy (MBE) technique. Energy band simulation using commercial CASTEP code indicates that SnS has an indirect bandgap of size 0.982 eV. Furthermore, our simulation shows that elemental Cu can be used as a p-type dopant for the material. Growth of high quality SnS thin films is accomplished by MBE technique using graphene as the buffer layer. We observed significant reduction in the rocking curve FWHM over the existing published values. Crystallite size in the range of 2-3 {mu}m is observed which is also significantly better than the existing results. Measurement of the absorption coefficient, {alpha}, is performed using a Hitachi U-4100 Spectrophotometer system which demonstrate large values of {alpha} of the order of 10{sup 4} cm{sup -1}. Sharp cutoff in the values of {alpha}, as a function of energy, is observed for the films grown using a graphene buffer layer indicating low concentration of localized states in the bandgap. Cu-doping is achieved by co-evaporation technique. It is demonstrated that the hole concentration of the films can be controlled between 10{sup 16} cm{sup -3} and 5 x 10{sup 17}cm{sup -3} by varying the temperature of the Cu K-cell. Hole mobility as high as 81 cm{sup 2}V{sup -1}s{sup -1} is observed for SnS films on graphene/GaAs(100) substrates. The improvements in the physical properties of the films are attributed to the unique layered structure and chemically saturated bonds at the surface for both SnS and the graphene buffer layer. Consequently, the interaction between the SnS thin films and the graphene buffer layer is dominated by van der Waals force and structural defects at the interface, such as dangling bonds or dislocations, are substantially reduced.

  7. Assessment of 4H-SiC epitaxial layers and high resistivity bulk crystals for radiation detectors

    NASA Astrophysics Data System (ADS)

    Mandal, Krishna C.; Muzykov, Peter G.; Chaudhuri, Sandeep K.; Terry, J. R.

    2012-10-01

    We present results of structural, electrical, and defect characterization of 4H-SiC epitaxial layers and bulk crystals and show performance of the radiation detectors fabricated from these materials. The crystal quality was evaluated by x-ray diffraction (XRD) rocking curve measurements, electron beam induced current (EBIC) imaging, and defect delineating etching in conjunction with optical microscopy and scanning electron microscopy (SEM). Studies of the electrically active intrinsic defects and impurities were conducted using thermally stimulated current (TSC) measurements in a wide temperature range of 94 - 750K. The results are correlated with the capability of bulk crystals and epitaxial layers for the detection of α-particles, low to high energy x-rays and gamma rays. High barrier rectifying Schottky diodes have been fabricated and tested. The epitaxial 4H-SiC radiation detectors exhibited low leakage current (< 1 nA) at ~ 200 V operating voltage up to 200 C. The soft x-ray responsivity measurements performed at the National Synchrotron Light Source (NSLS) at Brookhaven National Lab (BNL) showed significantly improved characteristics compared to commercially-available SiC UV photodiode detectors.

  8. Epitaxial Crystal Silicon Absorber Layers and Solar Cells Grown at 1.8 Microns per Minute: Preprint

    SciTech Connect

    Bobela, D. C.; Teplin, C. W.; Young, D. L.; Branz, H. M.; Stradins, P.

    2011-07-01

    We have grown device-quality epitaxial silicon thin films at growth rates up to 1.8 μm/min, using hot-wire chemical vapor deposition from silane at substrate temperatures below 750 degrees C. At these rates, which are more than 30 times faster than those used by the amorphous and nanocrystalline Si industry, capital costs for large-scale solar cell production would be dramatically reduced, even for cell absorber layers up to 10 ?m thick. We achieved high growth rates by optimizing the three key parameters: silane flow, depletion, and filament geometry, based on our model developed earlier. Hydrogen coverage of the filament surface likely limits silane decomposition and growth rate at high system pressures. No considerable deterioration in PV device performance is observed when grown at high rate, provided that the epitaxial growth is initiated at low rate. A simple mesa device structure (wafer/epi Si/a-Si(i)/a-Si:H(p)/ITO) with a 2.3 um epitaxial silicon absorber layer was grown at 700 nm/min. The finished device had an open-circuit voltage of 0.424 V without hydrogenation treatment.

  9. Surface-morphology evolution during growth-interrupt in situ annealing on GaAs(110) epitaxial layers

    SciTech Connect

    Yoshita, Masahiro; Akiyama, Hidefumi; Pfeiffer, Loren N.; West, Ken W.

    2007-05-15

    Temperature and surface-coverage dependence of the evolution of surface morphology during growth-interrupt in situ annealing on GaAs epitaxial layers grown on the singular (110) cleaved edges by the cleaved-edge overgrowth method with molecular-beam epitaxy has been studied by means of atomic force microscopy. Annealing at substrate temperatures below 630 degree sign C produced atomically flat surfaces with characteristic islands or pits, depending on the surface coverage. The atomic flatness of the surfaces is enhanced with increasing annealing temperature owing to the enhanced adatom migration. At a higher annealing temperature of about 650 degree sign C, however, 2-monolayer-deep triangular pits with well-defined step edges due to Ga-atom desorption from the crystal appeared in the atomically flat surface. The growth-interrupt annealing temperature optimal for the formation of atomically flat GaAs(110) surfaces is therefore about 630 degree sign C.

  10. Segregation of Sb in Ge epitaxial layers and its usage for the selective doping of Ge-based structures

    SciTech Connect

    Antonov, A. V.; Drozdov, M. N.; Novikov, A. V. Yurasov, D. V.

    2015-11-15

    The segregation of Sb in Ge epitaxial layers grown by the method of molecular beam epitaxy on Ge (001) substrates is investigated. For a growth temperature range of 180–325°C, the temperature dependence is determined for the segregation ratio of Sb in Ge, which shows a sharp increase (by more than three orders of magnitude) with increasing temperature. The strong dependence of the segregation properties of Sb on the growth temperature makes it possible to adapt a method based on the controlled use of segregation developed previously for the doping of Si structures for the selective doping of Ge structures with a donor impurity. Using this method selectively doped Ge:Sb structures, in which the bulk impurity concentration varies by an order of magnitude at distances of 3–5 nm, are obtained.

  11. Mechanisms of recombination of nonequilibrium charge carriers in epitaxial Cd{sub x}Hg{sub 1-x}Te (x = 0.20-0.23) layers

    SciTech Connect

    Ikusov, D. G.; Sizov, F. F.; Staryi, S. V. Teterkin, V. V.

    2007-02-15

    The experimental temperature dependences of the photosensitivity and the data on the lifetime of nonequilibrium charge carriers in epitaxial Cd{sub x}Hg{sub 1-x}Te layers with x = 0.20-0.23 were used to show that, in the region of intrinsic and extrinsic conductivity in n-type films grown by molecular beam epitaxy, CHCC Auger recombination is the prevailing recombination mechanism. At the same time, in p-type films grown by liquid-or vapor-phase epitaxy, it is observed that, in the region of extrinsic conductivity, CHLH Auger recombination competes with Shockley-Read recombination. The n-type films grown by molecular beam epitaxy contain a much lower concentration of recombination centers than the p-type films grown by liquid-or gasphase epitaxy.

  12. NMR spectroscopy with force-gradient detection on a GaAs epitaxial layer.

    PubMed

    Alexson, Dimitri A; Smith, Doran D

    2013-10-01

    We demonstrate nuclear magnetic resonance spectroscopy on 35 μm(3) of (69)Ga in a GaAs epitaxial layer in vacuum at 5K, and 5T yielding a linewidth on the order of 10 kHz. This was achieved by a force-gradient magnetic resonance detection scheme, using the interaction between the force-gradient of a Ni sphere-tipped single crystal Si cantilever and the nuclear spins to register changes in the spin state as a change in the driven cantilever's natural resonant frequency. The dichotomy between the background magnetic field (B0) homogeneity requirements imposed by NMR spectroscopy and the magnetic particle's large magnetic field gradient is resolved via sample shuttling during the NMR pulse encoding. A GaAs sample is polarized in a B0 of 5T for 3 T1. The sample is shuttled away from the magnetic particle to a region of negligible magnetic field inhomogeneity. A (π/2)x pulse rotates the polarization to the xy-plane, the magnetization is allowed to precess for 2-200 μs before a (π/2)x or (π/2)y pulse stores the remaining spin along the z-axis that represents a single point of the free induction decay (FID). The sample is shuttled back to the established tip-sample distance. An adiabatic rapid passage (ARP) sweep inverts the spins in a volume of interest, causing the cantilever's natural resonance frequency to shift an amount proportional to the spin polarization in the volume. By varying the delay between the first and second (π/2) pulses the entire FID is measured. PMID:23962899

  13. Synthesis, structure and electrochemical properties of novel Li-Co-Mn-O epitaxial thin-film electrode using layer-by-layer deposition process

    NASA Astrophysics Data System (ADS)

    Lim, Jaemin; Lee, Soyeon; Suzuki, Kota; Kim, KyungSu; Kim, Sangryun; Taminato, Sou; Hirayama, Masaaki; Oshima, Yoshifumi; Takayanagi, Kunio; Kanno, Ryoji

    2015-04-01

    A novel epitaxial thin-film electrode for lithium batteries, with a composition of Li0.92Co0.65Mn1.35O4 and a cubic spinel structure, is fabricated on a SrTiO3(111) single-crystal substrate. Fabrication is carried out by layer-by-layer pulsed laser deposition of LiCoO2 with a layered rock-salt structure and LiMn2O4 with a spinel structure. The electrode is found to exhibit unique disordering of the lithium (8a) and transition-metal (16d) sites, leading to a higher rate capability and cycle retention ratio than those for a thin-film electrode with the same composition prepared by a conventional single-step deposition process. The proposed layer-by-layer deposition method allows an expanded range of compositional and structural variations for lithium battery electrode materials.

  14. Energy band alignment of atomic layer deposited HfO{sub 2} oxide film on epitaxial (100)Ge, (110)Ge, and (111)Ge layers

    SciTech Connect

    Hudait, Mantu K.; Zhu Yan

    2013-03-21

    Crystallographically oriented epitaxial Ge layers were grown on (100), (110), and (111)A GaAs substrates by in situ growth process using two separate molecular beam epitaxy chambers. The band alignment properties of atomic layer hafnium oxide (HfO{sub 2}) film deposited on crystallographically oriented epitaxial Ge were investigated using x-ray photoelectron spectroscopy (XPS). Valence band offset, {Delta}E{sub v} values of HfO{sub 2} relative to (100)Ge, (110)Ge, and (111)Ge orientations were 2.8 eV, 2.28 eV, and 2.5 eV, respectively. Using XPS data, variation in valence band offset, {Delta}E{sub V}(100)Ge>{Delta}E{sub V}(111)Ge>{Delta}E{sub V}(110)Ge, was obtained related to Ge orientation. Also, the conduction band offset, {Delta}E{sub c} relation, {Delta}E{sub c}(110)Ge>{Delta}E{sub c}(111)Ge>{Delta}E{sub c}(100)Ge related to Ge orientations was obtained using the measured bandgap of HfO{sub 2} on each orientation and with the Ge bandgap of 0.67 eV. These band offset parameters for carrier confinement would offer an important guidance to design Ge-based p- and n-channel metal-oxide field-effect transistor for low-power application.

  15. Phase-separated, epitaxial composite cap layers for electronic device applications and method of making the same

    DOEpatents

    Aytug, Tolga; Paranthaman, Mariappan Parans; Polat, Ozgur

    2012-07-17

    An electronic component that includes a substrate and a phase-separated layer supported on the substrate and a method of forming the same are disclosed. The phase-separated layer includes a first phase comprising lanthanum manganate (LMO) and a second phase selected from a metal oxide (MO), metal nitride (MN), a metal (Me), and combinations thereof. The phase-separated material can be an epitaxial layer and an upper surface of the phase-separated layer can include interfaces between the first phase and the second phase. The phase-separated layer can be supported on a buffer layer comprising a composition selected from the group consisting of IBAD MgO, LMO/IBAD-MgO, homoepi-IBAD MgO and LMO/homoepi-MgO. The electronic component can also include an electronically active layer supported on the phase-separated layer. The electronically active layer can be a superconducting material, a ferroelectric material, a multiferroic material, a magnetic material, a photovoltaic material, an electrical storage material, and a semiconductor material.

  16. Crystal Growth and Characterization of Epitaxial Layers of Laser and Nonlinear Optical Materials for Thin-Disk and Waveguide laser applications

    SciTech Connect

    W Bolanos; M Segura; J Cugat; J Carvajal; X Mateos; M Pujol; R Solé; F Díaz; M Aguiló; et. al.

    2011-12-31

    This paper summarizes the main results we obtained in our laboratories in relation with crystalline layers obtained by liquid phase epitaxial growth of lanthanide doped KLu(WO{sub 4}){sub 2} and Nb:RbTiOPO{sub 4} grown on KLu(WO{sub 4}){sub 2} and RbTiOPO{sub 4} substrates, respectively. Macroscopic defect free epitaxial layers were grown and characterized in terms of their compositional homogeneity, structural stress in the layer/substrate interface and laser and waveguiding performances.

  17. The driving force for glide of a threading dislocation in a strained epitaxial layer on a substrate

    NASA Astrophysics Data System (ADS)

    Freund, L. B.

    T HE PROCESS of epitaxial growth of a very thin layer onto a substrate crystal is considered for the particular situation in which the layer and substrate materials have the same crystal structure and orientation but different lattice parameters. Under these conditions, the layer grows with an intrinsic elastic strain determined by the mismatch in lattice parameters. The associated stress in the crystalline layer provides a driving force for the nucleation and motion of defects, primarily dislocations. The focus here is on the glide of a dislocation extending from the free surface of the layer to the layer-substrate interface, the so-called threading dislocation. A general definition of driving force for glide of a threading dislocation is introduced on the basis of work arguments. The definition is then applied to calculate the driving force for steady motion of an isolated threading dislocation in a strained layer, and the result includes Matthews' critical thickness concept as one of its features. Next, a kinetic equation for glide of a dislocation in semiconductor materials is proposed to estimate the glide rate of a threading dislocation in these low mobility materials. Finally, for the case of cubic materials, the general definition of driving force is applied to estimate the additional driving force on a threading dislocation due to an encounter with a dislocation on an intersecting glide plane. The results indicate that this effect is significant in blocking the glide of a threading dislocation for large mismatch strains and for layer thicknesses near the critical thickness.

  18. Molecular beam epitaxy growth of SrO buffer layers on graphite and graphene for the integration of complex oxides

    DOE PAGESBeta

    Ahmed, Adam S.; Wen, Hua; Ohta, Taisuke; Pinchuk, Igor V.; Zhu, Tiancong; Beechem, Thomas; Kawakami, Roland K.

    2016-04-27

    Here, we report the successful growth of high-quality SrO films on highly-ordered pyrolytic graphite (HOPG) and single-layer graphene by molecular beam epitaxy. The SrO layers have (001) orientation as confirmed by X-ray diffraction (XRD) while atomic force microscopy measurements show continuous pinhole-free films having rms surface roughness of <1.5 Å. Moreover, transport measurements of exfoliated graphene, after SrO deposition, show a strong dependence between the Dirac point and Sr oxidation. As a result, the SrO is leveraged as a buffer layer for more complex oxide integration via the demonstration of (001) oriented SrTiO3 grown atop a SrO/HOPG stack.

  19. Epitaxial CeO2 buffer layers for YBa2Cu3O(7-delta) films on sapphire

    NASA Astrophysics Data System (ADS)

    Maul, M.; Schulte, B.; Haeussler, P.; Frank, G.; Steinborn, T.; Fuess, H.; Adrian, H.

    1993-08-01

    The paper reports the successful in situ preparation of thin epitaxial CeO2 buffer layers and YBa2Cu3O(7-delta) (YBCO) films on (1 -1 0 2) Al2O3 substrates by electron beam coevaporation, using an evaporation system (Leybold L560) with four sources. Electron beam sources were used for Y, Ba, and Ce, while Cu was evaporated from a resistively heated tungsten boat. The buffer layers show very smooth surfaces and structural properties close to those of a single crystal. High quality YBCO films grown on these buffer layers have Tc not 88 K or above and j(c) values of 10 exp 6 A/sq cm or greater.

  20. Elemental boron-doped p(+)-SiGe layers grown by molecular beam epitaxy for infrared detector applications

    NASA Technical Reports Server (NTRS)

    Lin, T. L.; George, T.; Jones, E. W.; Ksendzov, A.; Huberman, M. L.

    1992-01-01

    SiGe/Si heterojunction internal photoemission (HIP) detectors have been fabricated utilizing molecular beam epitaxy of p(+)-SiGe layers on p(-)-Si substrates. Elemental boron from a high-temperature effusion cell was used as the dopant source during MBE growth, and high doping concentrations have been achieved. Strong infrared absorption, mainly by free-carrier absorption, was observed for the degenerately doped SiGe layers. The use of elemental boron as the dopant source allows a low MBE growth temperature, resulting in improved crystalline quality and smooth surface morphology of the Si(0.7)Ge(0.3) layers. Nearly ideal thermionic emission dark current characteristics have been obtained. Photoresponse of the HIP detectors in the long-wavelength infrared regime has been demonstrated.

  1. Molecular beam epitaxy growth of SrO buffer layers on graphite and graphene for the integration of complex oxides

    NASA Astrophysics Data System (ADS)

    Ahmed, Adam S.; Wen, Hua; Ohta, Taisuke; Pinchuk, Igor V.; Zhu, Tiancong; Beechem, Thomas; Kawakami, Roland K.

    2016-08-01

    We report the successful growth of high-quality SrO films on highly-ordered pyrolytic graphite (HOPG) and single-layer graphene by molecular beam epitaxy. The SrO layers have (001) orientation as confirmed by X-ray diffraction (XRD) while atomic force microscopy measurements show continuous pinhole-free films having rms surface roughness of <1.5 Å. Transport measurements of exfoliated graphene after SrO deposition show a strong dependence between the Dirac point and Sr oxidation. Subsequently, the SrO is leveraged as a buffer layer for more complex oxide integration via the demonstration of (001) oriented SrTiO3 grown atop a SrO/HOPG stack.

  2. Tunneling Atomic Force Microscopy Studies on Surface Growth Pits Due to Dislocations in 4H-SiC Epitaxial Layers

    NASA Astrophysics Data System (ADS)

    Ohtani, Noboru; Ushio, Shoji; Kaneko, Tadaaki; Aigo, Takashi; Katsuno, Masakazu; Fujimoto, Tatsuo; Ohashi, Wataru

    2012-08-01

    The morphological and electrical properties of surface growth pits caused by dislocations in 4H-SiC epitaxial layers were characterized using tunneling atomic force microscopy. The characteristic distribution of the tip current between the metal-coated atomic force microscopy tip and the SiC was observed within a large surface growth pit caused by a threading screw dislocation. The current was highly localized inside the pit and occurred only on the inclined surface in the up-step direction near the pit bottom. This paper discusses the causes and possible mechanisms of the observed tip current distribution inside surface growth pits.

  3. Epitaxial growth and characterization of thick multi-layer 4H-SiC for very high-voltage insulated gate bipolar transistors

    NASA Astrophysics Data System (ADS)

    Miyazawa, Tetsuya; Nakayama, Koji; Tanaka, Atsushi; Asano, Katsunori; Ji, Shi-yang; Kojima, Kazutoshi; Ishida, Yuuki; Tsuchida, Hidekazu

    2015-08-01

    Techniques to fabricate thick multi-layer 4H-SiC epitaxial wafers were studied for very high-voltage p- and n-channel insulated gate bipolar transistors (IGBTs). Multi-layer epitaxial growth, including a thick p- drift layer (˜180 μm), was performed on a 4H-SiC n+ substrate to form a p-IGBT structure. For an n-IGBT structure, an inverted growth process was employed, in which a thick n- drift layer (˜180 μm) and a thick p++ injector layer (>55 μm) were epitaxially grown. The epitaxial growth conditions were modified to attain a low defect density, a low doping concentration, and a long carrier lifetime in the drift layers. Reduction of the forward voltage drop was attempted by using carrier lifetime enhancement processes, specifically, carbon ion implantation/annealing and thermal oxidation/annealing or hydrogen annealing. Simple PiN diodes were fabricated to demonstrate the effective conductivity modulation in the thick drift layers. The forward voltage drops of the PiN diodes with the p- and n-IGBT structures promise to obtain the extremely low-loss and very high-voltage IGBTs. The change in wafer shape during the processing of the very thick multi-layer 4H-SiC is also discussed.

  4. Thermodynamic modeling of As and P incorporation In GaxIn1-xPyAs1-y epitaxial layers grown by organometallic vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Jordan, A. S.

    1995-11-01

    The quaternary epitaxial film Gaxln1-x As1-y (Q) lattice-matched to InP is the active layer in lasers emitting between 1.1 and 1.55 μm. In this paper, we present a thermodynamic analysis of the group V incorporation in Q layers prepared by organometallic vapor phase epitaxy. We have recently given an equilibrium description of the combined pyrolysis of AsH3 and PH3 for any input flow rate and H2 dilution as a function of growth temperature and total pressure, ptot. To extend the treatment to gas-solid equilibrium, the Q solid is considered to be a quaternary regular solution subject to the constraint of mixing on both sublattices, for which activities were previously published. Knowing the free-energy of formation of the four bounding binary compounds, a root for yp at a given temperature, input flow rates and ptot is obtained by iteration that stops at values ofP_{As_4 } andP_{P_4 } simultaneously satisfying the free-energies of formation and the gas flow material balance as well as the site conservation constraint. At a constant ptot in complete thermodynamic equilibrium, yp slowly increases with temperature (800 1200K). Taking into account the incomplete decomposition of PH3 and considering the undecomposed fraction of PH3 as an “inert” gas, the analysis shows a rapid rise in yp with temperature in the deposition zone. Clearly, to attain the desirable thermodynamic regime at, say, ˜650°C, the use of an alternative source, such as tertiarybutylphosphine, is desirable. We present the solid composition, yp, as a function of temperature and PH3 flow rate for realistic parameters for Q materials emitting between 1.1 1.55 urn. We also show the predicted lattice mismatch and emission wavelength associated with yp. A preliminary comparison with experimental data obtained in our laboratory is in reasonable accord with the calculated results.

  5. Effect of Ti seed layers on structure of self-organized epitaxial face-centered-cubic-Ag(001) oriented nanodots

    SciTech Connect

    Kamiko, M.; Nose, K.; Suenaga, R.; Kyuno, K.; Koo, J.-W.; Ha, J.-G.

    2013-12-28

    The influence of Ti seed layers on the structure of self-organized Ag nanodots, obtained with a Ti seed-layer-assisted thermal agglomeration method, has been investigated. The samples were grown on MgO(001) single crystal substrates by RF magnetron sputter deposition. The samples were deposited at room temperature and post-annealed at 350 °C for 4 h while maintaining the chamber vacuum conditions. The results of atomic force microscopy (AFM) observations indicated that the insertion of the Ti seed layer (0.6–5.0 nm) between the MgO substrate and Ag layer promotes the agglomeration process, forming the nanodot array. Comparisons between the AFM images revealed that the size of the Ag nanodots was increased with an increase in the Ti seed layer thickness. The atomic concentration of the film surface was confirmed by X-ray photoelectron spectroscopy (XPS). The XPS result suggested that the nanodot surface mainly consisted of Ag. Moreover, X-ray diffraction results proved that the initial deposition of the Ti seed layer (0.6–5.0 nm) onto MgO(001) prior to the Ag deposition yielded high-quality fcc-Ag(001) oriented epitaxial nanodots. The optical absorbance spectra of the fabricated Ag nanodots with various Ti seed layer thicknesses were obtained in the visible light range.

  6. Comparative study of polar and semipolar (112⁻2) InGaN layers grown by metalorganic vapour phase epitaxy

    SciTech Connect

    Dinh, Duc V. E-mail: peter.parbrook@tyndall.ie; Zubialevich, V. Z.; Oehler, F.; Kappers, M. J.; Humphreys, C. J.; Alam, S. N.; Parbrook, P. J. E-mail: peter.parbrook@tyndall.ie; Caliebe, M.; Scholtz, F.

    2014-10-21

    InGaN layers were grown simultaneously on (112⁻2) GaN and (0001) GaN templates by metalorganic vapour phase epitaxy. At higher growth temperature (≥750°C), the indium content (<15%) of the (112⁻2) and (0001) InGaN layers was similar. However, for temperatures less than 750°C, the indium content of the (112⁻2) InGaN layers (15%–26%) were generally lower than those with (0001) orientation (15%–32%). The compositional deviation was attributed to the different strain relaxations between the (112⁻2) and (0001) InGaN layers. Room temperature photoluminescence measurements of the (112⁻2) InGaN layers showed an emission wavelength that shifts gradually from 380 nm to 580 nm with decreasing growth temperature (or increasing indium composition). The peak emission wavelength of the (112⁻2) InGaN layers with an indium content of more than 10% blue-shifted a constant value of ≈(50–60) nm when using higher excitation power densities. This blue-shift was attributed to band filling effects in the layers.

  7. Improved crystalline properties of laser molecular beam epitaxy grown SrTiO{sub 3} by rutile TiO{sub 2} layer on hexagonal GaN

    SciTech Connect

    Luo, W. B.; Zhu, J.; Chen, H.; Wang, X. P.; Zhang, Y.; Li, Y. R.

    2009-11-15

    Epitaxial SrTiO{sub 3} films were fabricated by laser molecular beam epitaxy on bare and TiO{sub 2} buffered GaN(0002), respectively. The whole deposition processes were in situ monitored by reflection high energy electron diffraction (RHEED). X-ray diffraction (XRD) was carried out to study the growth orientation and crystalline quality of STO films. The interfacial characters and epitaxial relationships were also investigated by high revolution transition electron microscope and selected area electron diffraction (SAED). According to the RHEED observation, the lowest epitaxy temperature of STO on TiO{sub 2} buffered GaN was decreased compared with the direct deposited one. The epitaxial relationship was (111)[110]STO//(0002)[1120]GaN in both cases as confirmed by RHEED, XRD, and SAED. The full width at half maximum of omega-scan and PHI-scan of STO on TiO{sub 2} buffered GaN was reduced compared with that deposited on bare GaN, indicating that epitaxial quality of STO film is improved by inserting TiO{sub 2} layer. In summary, the lattice mismatch was reduced by inserting rutile TiO{sub 2}. As a result, the crystalline temperature was reduced and enhanced epitaxial quality of STO thin film was obtained.

  8. Wavefunction engineering: From quantum wells to near-infrared type-II colloidal quantum dots synthesized by layer-by-layer colloidal epitaxy.

    PubMed

    Li, J Jack; Tsay, James M; Michalet, Xavier; Weiss, Shimon

    2005-11-15

    We review the concept and the evolution of bandgap and wavefunction engineering, the seminal contributions of Dr. Chemla to the understanding of the rich phenomena displayed in epitaxially grown quantum confined systems, and demonstrate the application of these concepts to the colloidal synthesis of high quality type-II CdTe/CdSe quantum dots using successive ion layer adsorption and reaction chemistry. Transmission electron microscopy reveals that CdTe/CdSe can be synthesized layer by layer, yielding particles of narrow size distribution. Photoluminescence emission and excitation spectra reveal discrete type-II transitions, which correspond to energy lower than the type-I bandgap. The increase in the spatial separation between photoexcited electrons and holes as a function of successive addition of CdSe monolayers was monitored by photoluminescence lifetime measurements. Systematic increase in lifetimes demonstrates the high level of wavefunction engineering and control in these systems. PMID:22865949

  9. Epitaxial growth of AlN and Al0.5Ga0.5N layers on aluminum nitride substrates

    NASA Astrophysics Data System (ADS)

    Schowalter, L. J.; Shusterman, Y.; Wang, R.; Bhat, I.; Arunmozhi, G.; Slack, G. A.

    2000-02-01

    High quality epitaxial AlN and AlxGa1-xN layers have been grown by organo-metallic vapor-phase epitaxy on single crystal a-face AlN substrates. Here we report the characterization of these layers using Rutherford backscattering/ion channeling spectroscopy, atomic force microscopy, double crystal x-ray diffraction, and preliminary electrical results. Ion channeling along the [112¯0] axis gave a minimum yield of 1.5% for an AlN layer and 2.2% for an Al0.5Ga0.5N, indicating excellent crystal quality. A resistivity of 20 Ω cm and a mobility of 20 cm2/V s was measured in a Si-doped, 1-μm-thick Al0.5Ga0.5N grown epitaxially on the AlN substrates.

  10. Molecular beam epitaxial growth and characterization of GaSb layers on GaAs (0 0 1) substrates

    NASA Astrophysics Data System (ADS)

    Li, Yanbo; Zhang, Yang; Zhang, Yuwei; Wang, Baoqiang; Zhu, Zhanping; Zeng, Yiping

    2012-06-01

    We report on the growth of GaSb layers on GaAs (0 0 1) substrates by molecular beam epitaxy (MBE). We investigate the influence of the GaAs substrate surface treatment, growth temperature, and V/III flux ratios on the crystal quality and the surface morphology of GaSb epilayers. Comparing to Ga-rich GaAs surface preparation, the Sb-rich GaAs surface preparation can promote the growth of higher-quality GaSb material. It is found that the crystal quality, electrical properties, and surface morphology of the GaSb epilayers are highly dependent on the growth temperature, and Sb/Ga flux ratios. Under the optimized growth conditions, we demonstrate the epitaxial growth of high quality GaSb layers on GaAs substrates. The p-type nature of the unintentionally doped GaSb is studied and from the growth conditions dependence of the hole concentrations of the GaSb, we deduce that the main native acceptor in the GaSb is the Ga antisite (GaSb) defect.

  11. Surface passivation and isochronal annealing studies on n-type 4H-SiC epitaxial layer

    NASA Astrophysics Data System (ADS)

    Mannan, Mohammad A.; Nguyen, Khai V.; Pak, Rahmi; Oner, Cihan; Mandal, Krishna C.

    2015-09-01

    Schottky barrier radiation detectors were fabricated on the Si-face of 50 μm thick detector grade n-type 4H-SiC epitaxial layers. The junction properties of the fabricated detectors were investigated by current-voltage (I-V) and capacitancevoltage (C-V) measurements. The radiation detector performances were evaluated by alpha pulse height spectroscopy using a 0.1 μCi 241Am radiation source. Deep level transient spectroscopy (DLTS) measurements were carried out to identify and characterize the electrically active defect levels present in the epitaxial layers. The performance of the detector was found to be limited by the presence of electrically active defect centers in the epilayer. Deep level defects were reduced significantly by isochronal annealing. Surface passivation studies were conducted on n-type 4H-SiC epilayers for use on radiation detectors for the first time. Energy resolution of the detector was found to have improved after passivation and the life time killing defects that were responsible for preventing full charge collection were reduced significantly. Systematic and thorough C-DLTS studies were conducted prior and subsequent to isochronal annealing to observe evolution of the deep level defects.

  12. Effect of low-temperature annealing on the electronic- and band-structures of (Ga,Mn)As epitaxial layers

    NASA Astrophysics Data System (ADS)

    Yastrubchak, O.; Wosinski, T.; Gluba, L.; Andrearczyk, T.; Domagala, J. Z.; Żuk, J.; Sadowski, J.

    2014-01-01

    The effect of outdiffusion of Mn interstitials from (Ga,Mn)As epitaxial layers, caused by post-growth low-temperature annealing, on their electronic- and band-structure properties has been investigated by modulation photoreflectance (PR) spectroscopy. The annealing-induced changes in structural and magnetic properties of the layers were examined with high-resolution X-ray diffractometry and superconducting quantum interference device magnetometry, respectively. They confirmed an outdiffusion of Mn interstitials from the layers and an enhancement in their hole concentration, which were more efficient for the layer covered with a Sb cap acting as a sink for diffusing Mn interstitials. The PR results demonstrating a decrease in the band-gap-transition energy in the as-grown (Ga,Mn)As layers, with respect to that in the reference GaAs one, are interpreted by assuming a merging of the Mn-related impurity band with the GaAs valence band. Whereas an increase in the band-gap-transition energy caused by the annealing treatment of the (Ga,Mn)As layers is interpreted as a result of annealing-induced enhancement of the free-hole concentration and the Fermi level location within the valence band. The experimental results are consistent with the valence-band origin of itinerant holes mediating ferromagnetic ordering in (Ga,Mn)As, in agreement with the Zener model for ferromagnetic semiconductors.

  13. Effect of low-temperature annealing on the electronic- and band-structures of (Ga,Mn)As epitaxial layers

    SciTech Connect

    Yastrubchak, O. Gluba, L.; Żuk, J.; Wosinski, T. Andrearczyk, T.; Domagala, J. Z.; Sadowski, J.

    2014-01-07

    The effect of outdiffusion of Mn interstitials from (Ga,Mn)As epitaxial layers, caused by post-growth low-temperature annealing, on their electronic- and band-structure properties has been investigated by modulation photoreflectance (PR) spectroscopy. The annealing-induced changes in structural and magnetic properties of the layers were examined with high-resolution X-ray diffractometry and superconducting quantum interference device magnetometry, respectively. They confirmed an outdiffusion of Mn interstitials from the layers and an enhancement in their hole concentration, which were more efficient for the layer covered with a Sb cap acting as a sink for diffusing Mn interstitials. The PR results demonstrating a decrease in the band-gap-transition energy in the as-grown (Ga,Mn)As layers, with respect to that in the reference GaAs one, are interpreted by assuming a merging of the Mn-related impurity band with the GaAs valence band. Whereas an increase in the band-gap-transition energy caused by the annealing treatment of the (Ga,Mn)As layers is interpreted as a result of annealing-induced enhancement of the free-hole concentration and the Fermi level location within the valence band. The experimental results are consistent with the valence-band origin of itinerant holes mediating ferromagnetic ordering in (Ga,Mn)As, in agreement with the Zener model for ferromagnetic semiconductors.

  14. Depth-dependent phase change in Gd{sub 2}O{sub 3} epitaxial layers under ion irradiation

    SciTech Connect

    Mejai, N.; Debelle, A. Thomé, L.; Sattonnay, G.; Gosset, D.; Dargis, R.; Clark, A.

    2015-09-28

    Epitaxial Gd{sub 2}O{sub 3} thin layers with the cubic structure were irradiated with 4-MeV Au{sup 2+} ions in the 10{sup 13}–10{sup 15} cm{sup −2} fluence range. X-ray diffraction indicates that ion irradiation induces a cubic to monoclinic phase change. Strikingly, although the energy-deposition profile of the Au{sup 2+} ions is constant over the layer thickness, this phase transformation is depth-dependent, as revealed by a combined X-ray diffraction and ion channeling analysis. In fact, the transition initiates very close to the surface and propagates inwards, which can be explained by an assisted migration process of irradiation-induced defects. This result is promising for developing a method to control the thickness of the rare-earth oxide crystalline phases.

  15. Epitaxial growth and anisotropic strain relaxation of Ge1-xSnx layers on Ge(1 1 0) substrates

    NASA Astrophysics Data System (ADS)

    Asano, Takanori; Shimura, Yosuke; Taoka, Noriyuki; Nakatsuka, Osamu; Zaima, Shigeaki

    2013-05-01

    We have investigated the strain relaxation behavior and dislocation structures of Ge1-xSnx epitaxial layers on Ge(1 1 0) substrates. We found that the anisotropic strain relaxation of a Ge0.966Sn0.034 layer along the [0 0 1] direction preferentially occurs during postdeposition annealing over 500 °C. Transmission electron microscopy observation revealed that the anisotropic strain relaxation is attributed to the propagation of misfit dislocations along the two directions of [1¯ 1 0] and <1 1 2> at the Ge1-xSnx/Ge(1 1 0) interface. We found that the propagation of 60° dislocations preferentially occurs, which contributes to the strain relaxation only for the [0 0 1] direction.

  16. Fabrication of quasi-superlattices at the interface between 3 C-SiC epitaxial layer and substrates of hexagonal SiC polytypes by sublimation epitaxy in vacuum

    NASA Astrophysics Data System (ADS)

    Lebedev, A. A.; Davydov, S. Yu.; Sorokin, L. M.; Shakhov, L. V.

    2015-12-01

    Transmission electron microscopy has been used to study the structure of a transition layer between a hexagonal substrate (6 H-SiC and 4 H-SiC) and a cubic silicon carbide layer grown by sublimation epitaxy in vacuum. It is shown by microdiffraction analysis that the transition layer with a thickness of 210 nm is constituted by alternating layers of cubic (3 C) and hexagonal (6 H) silicon carbide. It is demonstrated that 6 H-SiC/3 C-SiC and 4 H-SiC/3 C-SiC quasi-superlattices can be produced by this method.

  17. Growth of Epitaxial Co Layers on Sb-Passivated GaAs(110) Substrates

    NASA Astrophysics Data System (ADS)

    Teodorescu, C. M.; Chrost, J.; Ascolani, H.; Avila, J.; Soria, F.; Asensio, M. C.

    The role of Sb in the formation of the Co/GaAs(110) interfaces has been investigated by angular photoelectron diffraction (PD), synchrotron-radiation (SR) core-level photoemission and low-energy electron diffraction. We find that Co forms a metastable bcc phase on GaAs(110), with its principal crystallographic axes parallel to the substrate. From polar-angle-scanned PD, we determine an outward expansion of up to 14% of the lattice constant perpendicular to the surface, for epitaxial Co films grown on nontreated substrates. By Sb passivation of the GaAs(110) surface prior to the Co deposition, the epitaxial quality of the metallic overlayer is improved. The resulting Co phase is found to grow in a perfect bcc (110) orientation with a minor disruption of the substrate underneath and a reduced intralayer spacing outward expansion of less than 1%.

  18. Epitaxial layers of 2122 BCSCO superconductor thin films having single crystalline structure

    NASA Technical Reports Server (NTRS)

    Pandey, Raghvendra K. (Inventor); Raina, Kanwal K. (Inventor); Solayappan, Narayanan (Inventor)

    1995-01-01

    A substantially single phase, single crystalline, highly epitaxial film of Bi.sub.2 CaSr.sub.2 Cu.sub.2 O.sub.8 superconductor which has a T.sub.c (zero resistance) of 83K is provided on a lattice-matched substrate with no intergrowth. This film is produced by a Liquid Phase Epitaxy method which includes the steps of forming a dilute supercooled molten solution of a single phase superconducting mixture of oxides of Bi, Ca, Sr, and Cu having an atomic ratio of about 2:1:2:2 in a nonreactive flux such as KCl, introducing the substrate, e.g., NdGaO.sub.3, into the molten solution at 850.degree. C., cooling the solution from 850.degree. C. to 830.degree. C. to grow the film and rapidly cooling the substrate to room temperature to maintain the desired single phase, single crystalline film structure.

  19. Growth of AlN layer on patterned sapphire substrate by hydride vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Lee, Gang Seok; Lee, Chanmi; Jeon, Hunsoo; Lee, Chanbin; Bae, Sung Geun; Ahn, Hyung Soo; Yang, Min; Yi, Sam Nyung; Yu, Young Moon; Lee, Jae Hak; Honda, Yoshio; Sawaki, Nobuhiko; Kim, Suck-Whan

    2016-05-01

    Even though a patterned sapphire substrate (PSS) has been used for the growth of a high-quality epilayer because of its many advantages, it has not been successfully used to grow an AlN epilayer for ultraviolet (UV) light-emitting diodes (LEDs) on a PSS up to now. We report the growth of a high-quality AlN epilayer on a PSS, as a substrate for the manufacture of UV LEDs, by hydride vapor phase epitaxy (HVPE). The X-ray diffraction (XRD) peaks for the AlN epilayer grown on the PSS indicate that crystalline AlN with a wurtzite structure was grown successfully on the PSS. Furthermore, HVPE combining both in situ HVPE technology and liquid-phase epitaxy (LPE) using a mixed source is proposed as a novel method for the growth of a flat AlN epilayer on a PSS.

  20. Investigation of the asymmetric misfit dislocation morphology in epitaxial layers with the zinc-blende structure

    NASA Technical Reports Server (NTRS)

    Fox, Bradley A.; Jesser, William A.

    1990-01-01

    The source of the asymmetry in the dislocation morphology exhibited in the epitaxial growth of compound semiconductors on (100) was investigated. A thickness wedge of p- and n-type GaAs(0.95)P(0.05) was grown on GaAs by metalorganic chemical vapor deposition, and the effect of misorientation on the resolved shear stress for each slip system was calculated and eliminated as the source of the asymmetry. Another potential source of asymmetry, the thickness gradient, was also eliminated. Results show that the substrate misorientation and the thickness gradient do not significantly contribute to the asymmetry and that the dominant contributor to the asymmetry of misfit dislocations in the (001) epitaxial interface can be attributed to the differences in the Peierls barriers between the two types of dilocations in GaAsP/GaAs.

  1. Nanometer-Scale Epitaxial Strain Release in Perovskite Heterostructures Using 'SrAlOx' Sliding Buffer Layers

    SciTech Connect

    Bell, Christopher

    2011-08-11

    We demonstrate the strain release of LaAlO{sub 3} epitaxial film on SrTiO{sub 3} (001) by inserting ultra-thin 'SrAlO{sub x}' buffer layers. Although SrAlO{sub x} is not a perovskite, nor stable as a single phase in bulk, epitaxy stabilizes the perovskite structure up to a thickness of 2 unit cells (uc). At a critical thickness of 3 uc of SrAlO{sub x}, the interlayer acts as a sliding buffer layer, and abruptly relieves the lattice mismatch between the LaAlO{sub 3} filmand the SrTiO{sub 3} substrate, while maintaining crystallinity. This technique may provide a general approach for strain relaxation of perovskite film far below the thermodynamic critical thickness. A central issue in heteroepitaxial filmgrowth is the inevitable difference in lattice constants between the filmand substrate. Due to this lattice mismatch, thin film are subjected to microstructural strain, which can have a significan effect on the filmproperties. This challenge is especially prominent in the rapidly developing fiel of oxide electronics, where much interest is focused on incorporating the emergent physical properties of oxides in devices. Although strain can be used to great effect to engineer unusual ground states, it is often deleterious for bulk first-orde phase transitions, which are suppressed by the strain and symmetry constraints of the substrate. While there are some reports discussing the control of the lattice mismatch in oxides using thick buffer layers, the materials choice, lattice-tunable range, and control of misfit dislocations are still limited. In this Letter, we report the fabrication of strain-relaxed LaAlO{sub 3} (LAO) thin film on SrTiO{sub 3} (STO) (001) using very thin 'SrAlO{sub x}' (SAO) buffer layers. Whereas for 1 or 2 pseudo-perovskite unit cells (uc) of SAO, the subsequent LAO filmis strained to the substrate, at a critical thickness of 3 uc the SAO interlayer abruptly relieves the lattice mismatch between the LAO and the STO, although maintaining the

  2. Oxygen Impurities and Defects in Epitaxial Layer SiC and SiC Wafer Characterized by Room and Low Temperatures FTIR

    NASA Technical Reports Server (NTRS)

    Lu, W. J.; Collins, W. E.; Shi, D. T.; Tung, Y. S.; Larkin, D. J.

    1998-01-01

    SiC as a highly promising semiconducting material has received increasing attention in the last decade. The impurities such as oxygen and hydrogen have a great effect in electronic properties of semiconducting materials. In this study, the FTIR spectra were measured at room temperature (25 C) and low temperature (-70 C) for an n-type SiC substrate, a p-type epitaxial layer SiC, and patterned Ta on a p-type epitaxial layer SiC sample. The oxygen related IR peaks were measured for all three samples at room and low temperatures. The peak at 1105 cm(exp -1) is the result of a substitutional carbon and a interstitial oxygen in SiC. The concentration of the impurity oxygen increases in the SiC epitaxial layer during the CVD and electron beam processes. For the n-type SiC substrate, this peak does not appear. The peak at 905 cm(exp -1) exists in the IR spectra only for two epitaxial layer on p-type SiC substrate samples. This peak is related to oxygen vacancy centers in SiC, which are introduced in the CVD epitaxial growth process. At low temperature, the peak at 1105 cm(exp -1) shifts down and the peak at 905 cm(exp -1) shifts up for the epitaxial layer SiC samples. It can be explained that, at low temperatures, the stress increases due to the distorted bonds. The study shows that FTIR is a very effective method to evaluate low concentration impurities in SiC.

  3. Photoconductivity of ultra-thin Ge(GeSn) layers grown in Si by low-temperature molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Talochkin, A. B.; Chistokhin, I. B.; Mashanov, V. I.

    2016-04-01

    Photoconductivity (PC) spectra of Si/Ge(GeSn)/Si structures with the ultra-thin (1.0-2.3 nm) Ge and GeSn alloy layers grown by the low-temperature (T = 100 °C) molecular beam epitaxy are studied. Photoresponse in the range of 1.2-0.4 eV related to light absorption in the buried Ge(GeSn) layer is observed. It is shown that in case of lateral PC, a simple diffusion model can be used to determine the absorption coefficient of this layer α ˜ 105 cm-1. This value is 100 times larger than that of a single Ge quantum dot layer and is reached significantly above the band gap of most bulk semiconductors. The observed absorption is caused by optical transitions between electron and hole states localized at the interfaces. The anomalous high value of α can be explained by the unusual state of Ge(GeSn) layer with high concentration of dangling bonds, the optical properties of which have been predicted theoretically by Knief and von Niessen (Phys. Rev. B 59, 12940 (1999)).

  4. Effect of in situ Sb doping on crystalline and electrical characteristics of n-type Ge1- x Sn x epitaxial layer

    NASA Astrophysics Data System (ADS)

    Jeon, Jihee; Asano, Takanori; Shimura, Yosuke; Takeuchi, Wakana; Kurosawa, Masashi; Sakashita, Mitsuo; Nakatsuka, Osamu; Zaima, Shigeaki

    2016-04-01

    We examined the molecular beam epitaxy of Ge1- x Sn x with in situ Sb doping on Ge substrates. The effects of Sb doping on the crystalline and electrical characteristics of Ge1- x Sn x epitaxial layer were investigated in detail. We found that Sb doping with a concentration of 1020 cm-3 remarkably improves the crystallinity, and surface uniformity of the Ge1- x Sn x epitaxial layer by changing the growth mode by the surfactant effect of Sb atoms. Low-temperature Ge1- x Sn x growth with in situ Sb doping realizes a very high electron concentration of 1020 cm-3, which is above the thermal equilibrium solid solubility, as a result of suppressing Sb segregation and precipitation.

  5. Aluminum Nitride Grown by Atomic Layer Epitaxy Characterized with Real-Time Grazing Incidence Small Angle X-ray Scattering

    NASA Astrophysics Data System (ADS)

    Anderson, Virginia; Nepal, Neeraj; Johnson, Scooter; Robinson, Zachary; Demasi, Alexander; Hite, Jennifer; Ludwig, Karl; Eddy, Charles

    Aluminum nitride, gallium nitride, and indium nitride are being considered for many applications, and are currently being used commercially for LEDs. These III-nitride films are conventionally deposited by metalorganic chemical vapor deposition and molecular beam epitaxy. Research into depositing III-nitrides with atomic layer epitaxy (ALE) is underway as it is a fabrication friendly technique for thin films at lower temperatures. AlN deposited with ALE at 500°C have been shown to have good crystallinity, but relatively high carbon and oxygen impurities, and understanding the film deposition mechanism is an ongoing project. Grazing incidence small angle x-ray scattering (GISAXS) is sensitive to surface features, making it useful for real time monitoring of deposition processes. AlN was monitored by GISAXS while being deposited with ALE using trimethylaluminum and hydrogen/nitrogen plasma at the Brookhaven National Synchrotron Light Source and the Cornell High Energy Synchrotron Source. The GISAXS of AlN ALE at nominally 400°C, 450°C, and 500°C was compared to ex situ characterization with XPS and AFM.

  6. Epitaxial Growth of Thin Ferroelectric Polymer Films on Graphene Layer for Fully Transparent and Flexible Nonvolatile Memory.

    PubMed

    Kim, Kang Lib; Lee, Wonho; Hwang, Sun Kak; Joo, Se Hun; Cho, Suk Man; Song, Giyoung; Cho, Sung Hwan; Jeong, Beomjin; Hwang, Ihn; Ahn, Jong-Hyun; Yu, Young-Jun; Shin, Tae Joo; Kwak, Sang Kyu; Kang, Seok Ju; Park, Cheolmin

    2016-01-13

    Enhancing the device performance of organic memory devices while providing high optical transparency and mechanical flexibility requires an optimized combination of functional materials and smart device architecture design. However, it remains a great challenge to realize fully functional transparent and mechanically durable nonvolatile memory because of the limitations of conventional rigid, opaque metal electrodes. Here, we demonstrate ferroelectric nonvolatile memory devices that use graphene electrodes as the epitaxial growth substrate for crystalline poly(vinylidene fluoride-trifluoroethylene) (PVDF-TrFE) polymer. The strong crystallographic interaction between PVDF-TrFE and graphene results in the orientation of the crystals with distinct symmetry, which is favorable for polarization switching upon the electric field. The epitaxial growth of PVDF-TrFE on a graphene layer thus provides excellent ferroelectric performance with high remnant polarization in metal/ferroelectric polymer/metal devices. Furthermore, a fully transparent and flexible array of ferroelectric field effect transistors was successfully realized by adopting transparent poly[bis(4-phenyl)(2,4,6-trimethylphenyl)amine] semiconducting polymer. PMID:26618802

  7. Substrate Structures For Growth Of Highly Oriented And/Or Epitaxial Layers Thereon

    DOEpatents

    Arendt, Paul N.; Foltyn, Stephen R.; Groves, James R.; Jia, Quanxi

    2005-07-26

    A composite substrate structure including a substrate, a layer of a crystalline metal oxide or crystalline metal oxynitride material upon the substrate, a layer of an oriented cubic oxide material having a rock-salt-like structure upon the crystalline metal oxide or crystalline metal oxynitride material layer is provided together with additional layers such as one or more layers of a buffer material upon the oriented cubic oxide material layer. Jc's of 2.3×106 A/cm2 have been demonstrated with projected Ic's of 320 Amperes across a sample 1 cm wide for a superconducting article including a flexible polycrystalline metallic substrate, an inert oxide material layer upon the surface of the flexible polycrystalline metallic substrate, a layer of a crystalline metal oxide or crystalline metal oxynitride material upon the layer of the inert oxide material, a layer of an oriented cubic oxide material having a rock-salt-like structure upon the crystalline metal oxide or crystalline metal oxynitride material layer, a layer of a buffer material upon the oriented cubic oxide material layer, and, a top-layer of a high temperature superconducting material upon the layer of a buffer material.

  8. Growth optimization and applicability of thick on-axis SiC layers using sublimation epitaxy in vacuum

    NASA Astrophysics Data System (ADS)

    Jokubavicius, Valdas; Sun, Jianwu; Liu, Xinyu; Yazdi, Gholamreza; Ivanov, Ivan. G.; Yakimova, Rositsa; Syväjärvi, Mikael

    2016-08-01

    We demonstrate growth of thick SiC layers (100-200 μm) on nominally on-axis hexagonal substrates using sublimation epitaxy in vacuum (10-5 mbar) at temperatures varying from 1700 to 1975 °C with growth rates up to 270 μm/h and 70 μm/h for 6H- and 4H-SiC, respectively. The stability of hexagonal polytypes are related to process growth parameters and temperature profile which can be engineered using different thermal insulation materials and adjustment of the induction coil position with respect to the graphite crucible. We show that there exists a range of growth rates for which single-hexagonal polytype free of foreign polytype inclusions can be maintained. Further on, foreign polytypes like 3C-SiC can be stabilized by moving out of the process window. The applicability of on-axis growth is demonstrated by growing a 200 μm thick homoepitaxial 6H-SiC layer co-doped with nitrogen and boron in a range of 1018 cm-3 at a growth rate of about 270 μm/h. Such layers are of interest as a near UV to visible light converters in a monolithic white light emitting diode concept, where subsequent nitride-stack growth benefits from the on-axis orientation of the SiC layer.

  9. Photoluminescence study on heavily donor and acceptor impurity doped GaAs layers grown by molecular-beam epitaxy

    SciTech Connect

    Islam, A. Z. M. Touhidul; Jung, D. W.; Noh, J. P.; Otsuka, N.

    2009-05-01

    Gallium arsenide layers doped with high concentrations of Be and Si by molecular-beam epitaxy are studied by photoluminescence (PL) spectroscopy. PL peaks from doped layers are observed at energies significantly lower than the band-gap of GaAs. The growth and doping conditions suggest that the origin of these peaks is different from that of low energy PL peaks, which were observed in earlier studies and attributed to impurity-vacancy complexes. The dependence of the peak energy on the temperature and the annealing is found to differ from that of the peaks attributed to impurity-vacancy complexes. On the basis of these observations, it is suggested that the low energy peaks are attributed to short range ordered arrangements of impurity ions. This possibility is examined by calculations of the PL spectra with models of pairs of acceptor and donor delta-doped layers and PL experiments of a superlattice of pairs of Be and Si delta-doped layers.

  10. Epitaxial synthesis of diamond layers on a monocrystalline diamond substrate in a torch microwave plasmatron

    SciTech Connect

    Sergeichev, K. F. Lukina, N. A.

    2011-12-15

    The epitaxial growth of a diamond single-crystal film in a torch microwave discharge excited by a magnetron of a domestic microwave oven with the power of {<=}1 kW in an argon-hydrogen-methane mixture with a high concentration of methane (up to 25% with respect to hydrogen) at atmospheric pressure on a sub-strate of a synthetic diamond single crystal (HPHP) with the orientation (100) and 4 Multiplication-Sign 4 mm in size is obtained. A discharge with the torch diameter of {approx}2 mm and the concentration of the microwave power absorbed in the torch volume of >10{sup 3} W/cm{sup 3} is shown to be effective for epitaxial enlargement of a single crystal of synthetic diamond. The structure of the deposited film with the thickness up to 10 {mu}m with high-quality morphology is investigated with an optical microscope as well as using the methods of the Raman scattering and scanning electron microscopy.

  11. Characterization of the carrot defect in 4H-SiC epitaxial layers

    NASA Astrophysics Data System (ADS)

    Hassan, J.; Henry, A.; McNally, P. J.; Bergman, J. P.

    2010-05-01

    Characterization of the epitaxial defect known as the carrot defect was performed in thick 4H-SiC epilayers. A large number of carrot defects have been studied using different experimental techniques such as Nomarski optical microscopy, KOH etching, cathodoluminescence and synchrotron white beam X-ray topography. This has revealed that carrot defects appear in many different shapes and structures in the epilayers. Our results support the previous assignment of the carrot defect as related to a prismatic stacking fault. However, we have observed carrot defects with and without a visible threading dislocation related etch pit in the head region, after KOH etching. Polishing of epilayers in a few μm steps in combination with etching in molten KOH and imaging using Nomarski optical microscope has been used to find the geometry and origin of the carrot defects in different epilayers. The defects were found to originate both at the epi-substrate interface and during the epitaxial growth. Different sources of the carrot defect have been observed at the epi-substrate interface, which result in different structures and surfaces appearance of the defect in the epilayer. Furthermore, termination of the carrot defect inside the epilayer and the influence of substrate surface damage and growth conditions on the density of carrot defects are studied.

  12. GeSn p-i-n photodetectors with GeSn layer grown by magnetron sputtering epitaxy

    NASA Astrophysics Data System (ADS)

    Zheng, Jun; Wang, Suyuan; Liu, Zhi; Cong, Hui; Xue, Chunlai; Li, Chuanbo; Zuo, Yuhua; Cheng, Buwen; Wang, Qiming

    2016-01-01

    We report an investigation of normal-incidence GeSn-based p-i-n photodetectors (PDs) with a Ge0.94Sn0.06 active layer grown using sputter epitaxy on a Ge(100) substrate. A low dark current density of 0.24 A/cm2 was obtained at a reverse bias of 1 V. A high optical responsivity of the Ge0.94Sn0.06/Ge p-i-n PDs at zero bias was achieved, with an optical response wavelength extending to 1985 nm. The temperature-dependent optical-response measurement was performed, and a clear redshift absorption edge was observed. This work presents an approach for developing efficient and cost-effective GeSn-based infrared devices.

  13. 40 Gb/s InGaAlAs EML module based on identical epitaxial layer integration scheme

    NASA Astrophysics Data System (ADS)

    Sun, Changzheng; Xiong, Bing; Wang, Jian; Cai, Pengfei; Xu, Jianming; Zhou, Qiwei; Yuan, He; Luo, Yi

    2008-11-01

    High-speed AlGaInAs multiple-quantum-well (MQW) electroabsorption modulated lasers (EMLs) based on identical epitaxial layer (IEL) integration scheme are developed for 40 Gb/s optical fiber communication systems. The electroabsorption modulator (EAM) section adopts a narrow high-mesa waveguide formed by inductively coupled plasma (ICP) dry etching technique, and a self-aligned planarization technique is employed to further reduce the device capacitance. Resonances are observed in the small signal modulation response of the packaged EML module, which are attributed to parallel-plate modes of the coplanar waveguide (CPW) transmission line used for modulation signal feeding and the residual reflection at the modulator facet, respectively. The influence of such resonances on the large signal eyediagram performance of the device is studied, and methods for their suppression are presented. Clear eye opening under 40 Gb/s non-return-to-zero (NRZ) modulation has been demonstrated for the optimized EML module.

  14. Observation of different reflected high-energy electron diffraction patterns during atomic layer epitaxy growth of CdTe epilayers

    NASA Astrophysics Data System (ADS)

    Faschinger, W.; Juza, P.; Sitter, H.

    1991-12-01

    We present the first RHEED observations during atomic layer epitaxy growth of CdTe on GaAs substrates. The evolution of the RHEED pattern shows that, despite the large lattice mismatch, growth becomes two-dimensional after the deposition of a few monolayers. We observe intensity variations of two RHEED spots under surface resonance conditions and show that this new approach is superior to the observation of the specular spot for the measurement of surface coverages and adsorption kinetics. From the variation of the spot intensities with substrate temperature, we deduce that the Cd and Te surface coverages drop to 0.5 at substrate temperatures higher than 315°C.

  15. High quality InAlN single layers lattice-matched to GaN grown by molecular beam epitaxy

    SciTech Connect

    Gacevic, Z.; Fernandez-Garrido, S.; Calleja, E.; Estrade, S.

    2011-07-18

    We report on properties of high quality {approx}60 nm thick InAlN layers nearly in-plane lattice-matched to GaN, grown on c-plane GaN-on-sapphire templates by plasma-assisted molecular beam epitaxy. Excellent crystalline quality and low surface roughness are confirmed by X-ray diffraction, transmission electron microscopy, and atomic force microscopy. High annular dark field observations reveal a periodic in-plane indium content variation (8 nm period), whereas optical measurements evidence certain residual absorption below the band-gap. The indium fluctuation is estimated to be {+-} 1.2% around the nominal 17% indium content via plasmon energy oscillations assessed by electron energy loss spectroscopy with sub-nanometric spatial resolution.

  16. Electroburning of few-layer graphene flakes, epitaxial graphene, and turbostratic graphene discs in air and under vacuum

    PubMed Central

    Richter, Nils; Convertino, Domenica; Coletti, Camilla; Balestro, Franck; Wernsdorfer, Wolfgang; Kläui, Mathias; Affronte, Marco

    2015-01-01

    Summary Graphene-based electrodes are very promising for molecular electronics and spintronics. Here we report a systematic characterization of the electroburning (EB) process, leading to the formation of nanometer-spaced gaps, on different types of few-layer graphene (namely mechanically exfoliated graphene on SiO2, graphene epitaxially grown on the C-face of SiC and turbostratic graphene discs deposited on SiO2) under air and vacuum conditions. The EB process is found to depend on both the graphene type and on the ambient conditions. For the mechanically exfoliated graphene, performing EB under vacuum leads to a higher yield of nanometer-gap formation than working in air. Conversely, for graphene on SiC the EB process is not successful under vacuum. Finally, the EB is possible with turbostratic graphene discs only after the creation of a constriction in the sample using lithographic patterning. PMID:25821711

  17. Surface structure and surface kinetics of InN grown by plasma-assisted atomic layer epitaxy: A HREELS study

    SciTech Connect

    Acharya, Ananta R. E-mail: anantaach@gmail.com; Thoms, Brian D.; Nepal, Neeraj; Eddy, Charles R.

    2015-03-15

    The surface bonding configuration and kinetics of hydrogen desorption from InN grown by plasma-assisted atomic layer epitaxy have been investigated. High resolution electron energy loss spectra exhibited loss peaks assigned to a Fuchs–Kliewer surface phonon, N-N and N-H surface species. The surface N-N vibrations are attributed to surface defects. The observation of N-H but no In-H surface species suggested N-terminated InN. Isothermal desorption data were best fit by the first-order desorption kinetics with an activation energy of (0.88 ± 0.06) eV and pre-exponential factor of (1.5 ± 0.5) × 10{sup 5 }s{sup −1}.

  18. Novel neutral under layer materials to enhance the photolithography performance and defectivity for chemo-epitaxy process

    NASA Astrophysics Data System (ADS)

    Mizuochi, Ryuta; Wakayama, Hiroyuki; Someya, Yasunobu; Sakamoto, Rikimaru

    2016-03-01

    Neutral layer (NL) material is one of the key materials for aligning block-co-polymer (BCP). In this study, NLs were designed and investigated, which have the capability to enhance the photo-lithography performance, a good alignment performance of BCP, and reduce the defectivity after chemo-epitaxy process. In order to enhance the photo-lithography performance, some new polymers were prepared with chromophores to control n/k value and adhesive unit interacted with the photo resist. The surface energy of these materials was adjusted to the neutral for BCP by controlling the ratio of chromophore and adhesion unit. The defects were also investigated and achieved low defectivity by optimized materials. Since this material has the above properties, it shows a good perpendicularly alignment pattern of BCP and a photolithography performance.

  19. Epitaxial strontium titanate films grown by atomic layer deposition on SrTiO{sub 3}-buffered Si(001) substrates

    SciTech Connect

    McDaniel, Martin D.; Posadas, Agham; Ngo, Thong Q.; Dhamdhere, Ajit; Smith, David J.; Demkov, Alexander A.; Ekerdt, John G.

    2013-01-15

    Epitaxial strontium titanate (STO) films have been grown by atomic layer deposition (ALD) on Si(001) substrates with a thin STO buffer layer grown by molecular beam epitaxy (MBE). Four unit cells of STO grown by MBE serve as the surface template for ALD growth. The STO films grown by ALD are crystalline as-deposited with minimal, if any, amorphous SiO{sub x} layer at the STO-Si interface. The growth of STO was achieved using bis(triisopropylcyclopentadienyl)-strontium, titanium tetraisopropoxide, and water as the coreactants at a substrate temperature of 250 Degree-Sign C. In situ x-ray photoelectron spectroscopy (XPS) analysis revealed that the ALD process did not induce additional Si-O bonding at the STO-Si interface. Postdeposition XPS analysis also revealed sporadic carbon incorporation in the as-deposited films. However, annealing at a temperature of 250 Degree-Sign C for 30 min in moderate to high vacuum (10{sup -6}-10{sup -9} Torr) removed the carbon species. Higher annealing temperatures (>275 Degree-Sign C) gave rise to a small increase in Si-O bonding, as indicated by XPS, but no reduced Ti species were observed. X-ray diffraction revealed that the as-deposited STO films were c-axis oriented and fully crystalline. A rocking curve around the STO(002) reflection gave a full width at half maximum of 0.30 Degree-Sign {+-} 0.06 Degree-Sign for film thicknesses ranging from 5 to 25 nm. Cross-sectional transmission electron microscopy revealed that the STO films were continuous with conformal growth to the substrate and smooth interfaces between the ALD- and MBE-grown STO. Overall, the results indicate that thick, crystalline STO can be grown on Si(001) substrates by ALD with minimal formation of an amorphous SiO{sub x} layer using a four-unit-cell STO buffer layer grown by MBE to serve as the surface template.

  20. Topological insulator Bi{sub 2}Se{sub 3} thin films grown on double-layer graphene by molecular beam epitaxy

    SciTech Connect

    Song Canli; Jiang Yeping; Chang Cuizu; Xue Qikun; Wang Yilin; Zhang Yi; Wang Lili; He Ke; Fang Zhong; Dai Xi; Xie Xincheng; Ma Xucun; Chen Xi; Jia Jinfeng; Wang Yayu; Qi Xiaoliang; Zhang Shoucheng

    2010-10-04

    Atomically flat thin films of topological insulator Bi{sub 2}Se{sub 3} have been grown on double-layer graphene formed on 6H-SiC(0001) substrate by molecular beam epitaxy. By a combined study of reflection high energy electron diffraction and scanning tunneling microscopy, we identified the Se-rich condition and temperature criterion for layer-by-layer growth of epitaxial Bi{sub 2}Se{sub 3} films. The as-grown films without doping exhibit a low defect density of 1.0{+-}0.2x10{sup 11}/cm{sup 2}, and become a bulk insulator at a thickness of ten quintuple layers, as revealed by in situ angle resolved photoemission spectroscopy measurement.

  1. Structural properties of CdTe-ZnTe strained-layer superlattice grown on GaAs by hot-wall epitaxy

    NASA Astrophysics Data System (ADS)

    Sugiyama, I.; Hobbs, A.; Ueda, O.; Shinohara, K.; Takigawa, H.

    1991-06-01

    CdTe-ZnTe strained-layer superlattices (SLSs) were grown on GaAs by hot-wall epitaxy. The individual layer thickness of the SLS is well controlled and the thickness fluctuation is less than ±1 monolayer. High-resolution transmission electron microscopy images show coherent SLS growth. We found that two-thirds of the threading dislocations can be reduced by inserting the SLS in CdTe/GaAs.

  2. Hydride vapor phase epitaxy growth of GaN on sapphire with ZnO buffer layers

    NASA Astrophysics Data System (ADS)

    Gu, S.; Zhang, R.; Shi, Y.; Zheng, Y.; Zhang, L.; Kuech, T. F.

    The initial stages and subsequent growth of GaN on sapphire using ZnO buffer layers is reported for the hydride vapor phase epitaxy technique. A high gas-phase supersaturation in the growth ambient was used to favor a rapid initial growth on the substrate. A subsequent growth step was employed under conditions that favor a high lateral growth rate in order to promote the coalescence of the initial islands and provide optimal material properties. The specific gas-phase mole fractions of the GaCl and NH3 at the growth front control both the vertical and lateral growth rates. The use of a two-step growth process in the GaN growth leads to a controlled morphology and improved material properties for GaN materials when grown with a ZnO buffer layer. An optimized set of growth conditions, utilizing this two-step process, was found to also improve the growth directly on sapphire without a ZnO buffer layer.

  3. Kinetic limitation of chemical ordering in Bi2Te3-x Se x layers grown by molecular beam epitaxy.

    PubMed

    Schreyeck, S; Brunner, K; Kirchner, A; Bass, U; Grauer, S; Schumacher, C; Gould, C; Karczewski, G; Geurts, J; Molenkamp, L W

    2016-04-13

    We study the chemical ordering in Bi2Te3-x Se x grown by molecular beam epitaxy on Si substrates. We produce films in the full composition range from x  =  0 to 3, and determine their material properties using energy dispersive x-ray spectroscopy, x-ray diffraction and Raman spectroscopy. By fitting the parameters of a kinetic growth model to these results, we obtain a consistent description of growth at a microscopic level. Our main finding is that despite the incorporation of Se in the central layer being much more probable than that of Te, the formation of a fully ordered Te-Bi-Se-Bi-Te layer is prevented by kinetic of the growth process. Indeed, the Se concentration in the central layer of Bi2Te2Se1 reaches a maximum of only  ≈75% even under ideal growth conditions. A second finding of our work is that the intensity ratio of the 0 0 12 and 0 0 6 x-ray reflections serves as an experimentally accessible quantitative measure of the degree of ordering in these films. PMID:26962934

  4. Kinetic limitation of chemical ordering in Bi2Te3-x Se x layers grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Schreyeck, S.; Brunner, K.; Kirchner, A.; Bass, U.; Grauer, S.; Schumacher, C.; Gould, C.; Karczewski, G.; Geurts, J.; Molenkamp, L. W.

    2016-04-01

    We study the chemical ordering in Bi2Te3-x Se x grown by molecular beam epitaxy on Si substrates. We produce films in the full composition range from x  =  0 to 3, and determine their material properties using energy dispersive x-ray spectroscopy, x-ray diffraction and Raman spectroscopy. By fitting the parameters of a kinetic growth model to these results, we obtain a consistent description of growth at a microscopic level. Our main finding is that despite the incorporation of Se in the central layer being much more probable than that of Te, the formation of a fully ordered Te-Bi-Se-Bi-Te layer is prevented by kinetic of the growth process. Indeed, the Se concentration in the central layer of Bi2Te2Se1 reaches a maximum of only  ≈75% even under ideal growth conditions. A second finding of our work is that the intensity ratio of the 0 0 12 and 0 0 6 x-ray reflections serves as an experimentally accessible quantitative measure of the degree of ordering in these films.

  5. Wafer-scale arrayed p-n junctions based on few-layer epitaxial GaTe

    NASA Astrophysics Data System (ADS)

    Yuan, Xiang; Tang, Lei; Hu, Weida; Xiu, Faxian

    2015-03-01

    Two dimensional (2D) materials have showed appealing applications in electronics and optoelectronics. Gapless graphene presents ultra-broadband and fast photoresponse while the 2D semiconducting MoS2 and GaTe exhibit highly sensitive and tunable responsivity to the visible light. However, the device yield and its repeatability call for a further improvement of 2D materials to render large-scale uniformity. Here we report a layer-by-layer growth of the wafer-scale GaTe by molecular beam epitaxy. To develop the arrayed p-n junctions, the few-layer GaTe was grew on three-inch Si wafers. The resultant diodes reveal good rectifying characteristics and photoresponse with maximum photodetection responsivity of 2.74 A/W and photovoltaic external quantum efficiency up to 62%. The photocurrent reaches saturation very fast within 22 μs and shows no sign of device degradation after 1.37 million cycles of operation. Most strikingly, such high performance has been achieved across the entire wafer, making the volume production of devices accessible. Finally, several photo-images was acquired by using these photodiodes with a reasonable contrast and resolution, demonstrating for the first time the potential for these 2D technology coming into the real life.

  6. Characteristics of GaSb and GaInSb layers grown by metalorganic vapor phase epitaxy

    SciTech Connect

    Ehsani, H.; Bhat, I.; Hitchcock, C.; Borrego, J.; Gutmann, R.

    1995-07-01

    GaInSb and GaSb layers have been grown on GaSb and GaAs substrates using metalorganic vapor phase epitaxy (MOVPE) with trimethylgallium, trimethylindium and trimethylantimony as the sources. As grown layers are p type with the carrier concentration in the mid 10{sup 16} cm{sup {minus}3} range. N type layers are grown using diethyltellurium as the Te source. Incorporation of Te in high concentration showed compensation and secondary ion mass spectrometry (SIMS) result showed that only 2.5% of Te are active when 2 {times} 10{sup 19} cm{sup {minus}3} of Te was incorporated. The carrier concentration measured in n type samples increases as the temperature is lowered. This is explained by the presence of second band close to the conduction band minima. Silane which is a common n type dopant in GaAs and other III-V systems is shown to behave like p type in GaInSb. P-n junction structures have been grown on GaSb substrates to fabricate TPV cells.

  7. Seeding atomic layer deposition of high-k dielectrics on epitaxial graphene with organic self-assembled monolayers.

    PubMed

    Alaboson, Justice M P; Wang, Qing Hua; Emery, Jonathan D; Lipson, Albert L; Bedzyk, Michael J; Elam, Jeffrey W; Pellin, Michael J; Hersam, Mark C

    2011-06-28

    The development of high-performance graphene-based nanoelectronics requires the integration of ultrathin and pinhole-free high-k dielectric films with graphene at the wafer scale. Here, we demonstrate that self-assembled monolayers of perylene-3,4,9,10-tetracarboxylic dianhydride (PTCDA) act as effective organic seeding layers for atomic layer deposition (ALD) of HfO(2) and Al(2)O(3) on epitaxial graphene on SiC(0001). The PTCDA is deposited via sublimation in ultrahigh vacuum and shown to be highly ordered with low defect density by molecular-resolution scanning tunneling microscopy. Whereas identical ALD conditions lead to incomplete and rough dielectric deposition on bare graphene, the chemical functionality provided by the PTCDA seeding layer yields highly uniform and conformal films. The morphology and chemistry of the dielectric films are characterized by atomic force microscopy, ellipsometry, cross-sectional scanning electron microscopy, and X-ray photoelectron spectroscopy, while high-resolution X-ray reflectivity measurements indicate that the underlying graphene remains intact following ALD. Using the PTCDA seeding layer, metal-oxide-graphene capacitors fabricated with a 3 nm Al(2)O(3) and 10 nm HfO(2) dielectric stack show high capacitance values of ∼700 nF/cm(2) and low leakage currents of ∼5 × 10(-9) A/cm(2) at 1 V applied bias. These results demonstrate the viability of sublimated organic self-assembled monolayers as seeding layers for high-k dielectric films in graphene-based nanoelectronics. PMID:21553842

  8. Structural properties of relaxed thin film germanium layers grown by low temperature RF-PECVD epitaxy on Si and Ge (100) substrates

    SciTech Connect

    Cariou, R.; Ruggeri, R.; Tan, X.; Nassar, J.; Roca i Cabarrocas, P.; Mannino, Giovanni

    2014-07-15

    We report on unusual low temperature (175 °C) heteroepitaxial growth of germanium thin films using a standard radio-frequency plasma process. Spectroscopic ellipsometry and transmission electron microscopy (TEM) reveal a perfect crystalline quality of epitaxial germanium layers on (100) c-Ge wafers. In addition direct germanium crystal growth is achieved on (100) c-Si, despite 4.2% lattice mismatch. Defects rising from Ge/Si interface are mostly located within the first tens of nanometers, and threading dislocation density (TDD) values as low as 10{sup 6} cm{sup −2} are obtained. Misfit stress is released fast: residual strain of −0.4% is calculated from Moiré pattern analysis. Moreover we demonstrate a striking feature of low temperature plasma epitaxy, namely the fact that crystalline quality improves with thickness without epitaxy breakdown, as shown by TEM and depth profiling of surface TDD.

  9. The influence of growth conditions on the surface morphology and development of mechanical stresses in Al(Ga)N layers during metalorganic vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Lundin, W. V.; Zavarin, E. E.; Brunkov, P. N.; Yagovkina, M. A.; Troshkov, S. I.; Sakharov, A. V.; Nikolaev, A. E.; Tsatsulnikov, A. F.

    2016-04-01

    We have studied the influence of technological parameters on the surface morphology and development of mechanical stresses in Al(Ga)N layers during their growth by metalorganic vapor phase epitaxy (MOVPE) on sapphire substrates. Minimization of tensile stresses under conditions of a retained atomically smooth surface can be achieved by using a combination of factors including (i) nitridation of substrate in ammonia flow, (ii) formation of two-layer AlN-Al(Ga)N structures by introducing a small amount (several percent) of Ga after growth of a thin AlN layer, and (iii) reduction of ammonia flow during growth of an Al(Ga)N layer.

  10. Comparative study of single InGaN layers grown on Si(111) and GaN(0001) templates: The role of surface wetting and epitaxial constraint

    NASA Astrophysics Data System (ADS)

    Gómez, V. J.; Gačević, Ž.; Soto-Rodríguez, P. E. D.; Aseev, P.; Nötzel, R.; Calleja, E.; Sánchez-García, M. A.

    2016-08-01

    This work presents a comparative study, based mainly on X-ray diffraction analysis, of compact (~100 nm thick) and uniform single crystal InGaN layers (In content <35%) grown by plasma-assisted molecular beam epitaxy. InGaN layers have been grown directly on Si(111) substrates and on commercially available GaN(0001)-on-sapphire templates.. A high reactivity of atomic N with Si leads to a formation of amorphous SiN on Si substrate, i.e. an indirect crystal-to-crystal InGaN/SiN/Si contact; the weak InGaN interaction with the underlying substrate (weak epitaxial constraint) further leads to poor surface "wetting" and consequent 3D nucleation. The InGaN growth on GaN is, on the other hand, characterized by a direct crystal-to-crystal InGaN/GaN contact; the strong InGaN interaction with the underlying substrate (strong epitaxial constraint) leads to good surface "wetting" and consequent 2D nucleation. All studied InGaN layers show single epitaxial relationship to both Si(111) and GaN(0001)-on-sapphire substrates as well as a relatively good compositional uniformity (no trace of InGaN phase separation). However, layers grown on Si show significantly lower strain and inferior crystallographic uniformity i.e. higher disorder in crystallographic tilt and twist. The surface "wetting" (poor vs. good) and epitaxial constraint (weak vs. strong) are suggested as the main origins of these discrepancies.

  11. Soft epitaxy of nanocrystal superlattices

    NASA Astrophysics Data System (ADS)

    Rupich, Sara M.; Castro, Fernando C.; Irvine, William T. M.; Talapin, Dmitri V.

    2014-12-01

    Epitaxial heterostructures with precise registry between crystal layers play a key role in electronics and optoelectronics. In a close analogy, performance of nanocrystal (NC) based devices depends on the perfection of interfaces formed between NC layers. Here we systematically study the epitaxial growth of NC layers for the first time to enable the fabrication of coherent NC layers. NC epitaxy reveals an exceptional strain tolerance. It follows a universal island size scaling behaviour and shows a strain-driven transition from layer-by-layer to Stranski-Krastanov growth with non-trivial island height statistics. Kinetic bottlenecks play an important role in NC epitaxy, especially in the transition from sub-monolayer to multilayer coverage and the epitaxy of NCs with anisotropic shape. These findings provide a foundation for the rational design of epitaxial structures in a fundamentally and practically important size regime between atomic and microscopic systems.

  12. Stress-modified structural and electronic properties of epitaxial MnAs layers on GaAs

    NASA Astrophysics Data System (ADS)

    Takagaki, Y.; Herrmann, C.; Herfort, J.; Hucho, C.; Friedland, K.-J.

    2008-12-01

    We compare the transport properties in MnAs layers epitaxially grown on GaAs substrates with various orientation relationships, including MnAs(11¯00)/GaAs(001) , MnAs(0001)/GaAs(111), and MnAs(11¯00)/GaAs(111) . Due to the anisotropic abrupt change in the lattice constants at the phase transition between α - and β-MnAs , the phase-transition stress varies over a wide range depending on the c -axis orientation of MnAs. We employ the temperature range of the phase coexistence to evaluate the strength of the stress. The complex Fermi surface of MnAs is found to alter the Hall coefficient remarkably between holelike and electronlike behaviors in spite of rather subtle changes in the band structure by the strain. We also show that enormously strong pinning of domain walls arises in MnAs layers on GaAs(111)B when in-plane and out-of-plane c -axis orientations are simultaneously present.

  13. van der Waals Epitaxy of MoS2 Layers Using Graphene As Growth Templates

    SciTech Connect

    Shi, Yumeng; Zhou, Wu; Lu, Ang-Yu; Fang, Wenjing; Lee, Yi-Hsien; Hsu, Allen Long; Kim, Soo Min; Kim, Ki Kang; Yang, Hui Ying; Liang, Lain-Jong; Idrobo Tapia, Juan C; Kong, Jing

    2012-01-01

    We present a method for synthesizing MoS{sub 2}/Graphene hybrid heterostructures with a growth template of graphene-covered Cu foil. Compared to other recent reports, a much lower growth temperature of 400 C is required for this procedure. The chemical vapor deposition of MoS{sub 2} on the graphene surface gives rise to single crystalline hexagonal flakes with a typical lateral size ranging from several hundred nanometers to several micrometers. The precursor (ammonium thiomolybdate) together with solvent was transported to graphene surface by a carrier gas at room temperature, which was then followed by post annealing. At an elevated temperature, the precursor self-assembles to form MoS{sub 2} flakes epitaxially on the graphene surface via thermal decomposition. With higher amount of precursor delivered onto the graphene surface, a continuous MoS{sub 2} film on graphene can be obtained. This simple chemical vapor deposition method provides a unique approach for the synthesis of graphene heterostructures and surface functionalization of graphene. The synthesized two-dimensional MoS{sub 2}/Graphene hybrids possess great potential toward the development of new optical and electronic devices as well as a wide variety of newly synthesizable compounds for catalysts.

  14. Diffusion of Mn interstitials in (Ga,Mn)As epitaxial layers

    SciTech Connect

    Horak, L.; Matejova, J.; Marti, X.; Holy, V.; Novak, V.; Soban, Z.; Mangold, S.; Jimenez-Villacorta, F.

    2011-06-15

    The magnetic properties of thin (Ga,Mn)As layers improve during annealing by out-diffusion of interstitial Mn ions to a free surface. Out-diffused Mn atoms participate in the growth of a Mn-rich surface layer and a saturation of this layer causes an inhibition of the out-diffusion. We combine high-resolution x-ray diffraction with x-ray absorption spectroscopy and a numerical solution of the diffusion problem for the study of the out-diffusion of Mn interstitials during a sequence of annealing steps. Our data demonstrate that the out-diffusion of the interstitials is substantially affected by the internal electric field caused by an inhomogeneous distribution of charges in the (Ga,Mn)As layer.

  15. Surface chemistry and catalysis on well-defined epitaxial iron-oxide layers

    NASA Astrophysics Data System (ADS)

    Weiss, Werner; Ranke, Wolfgang

    2002-03-01

    Metal-oxide-based catalysts are used for many important synthesis reactions in the chemical industry. A better understanding of the catalyst operation can be achieved by studying elementary reaction steps on well-defined model catalyst systems. For the dehydrogenation of ethylbenzene to styrene in the presence of steam both unpromoted and potassium promoted iron-oxide catalysts are active. Here we review the work done over unpromoted single-crystalline FeO(1 1 1), Fe3O4(1 1 1) and α- Fe2O3(0 0 0 1) films grown epitaxially on Pt(1 1 1) substrates. Their geometric and electronic surface structures were characterized by STM, LEED, electron microscopy and electron spectroscopic techniques. In an integrative approach, the interaction of water, ethylbenzene and styrene with these films was investigated mainly by thermal desorption and photoelectron emission spectroscopy. The adsorption-desorption energetics and kinetics depend on the oxide surface terminations and are correlated to the electronic structures and acid-base properties of the corresponding oxide phases, which reveal insight into the nature of the active sites and into the catalytic function of semiconducting oxides in general. Catalytic studies, using a batch-reactor arrangement at high gas pressures and post-reaction surface analysis, showed that only α- Fe2O3(0 0 0 1) containing surface defects is catalytically active, whereas Fe3O4(1 1 1) is always inactive. This can be related to the elementary adsorption and desorption properties observed in ultrahigh vacuum, which indicates that the surface chemical properties of the iron-oxide films do not change significantly across the “pressure-gap”. A model is proposed according to which the active site involves a regular acidic surface site and a defect site next to it. The results on metal-oxide surface chemistry also have implications for other fields such as environmental science, biophysics and chemical sensors.

  16. Molecular beam epitaxy of free-standing wurtzite AlxGa1-xN layers

    NASA Astrophysics Data System (ADS)

    Novikov, S. V.; Staddon, C. R.; Martin, R. W.; Kent, A. J.; Foxon, C. T.

    2015-09-01

    Recent developments with group III nitrides present AlxGa1-xN based LEDs as realistic devices for new alternative deep ultra-violet light sources. Because there is a significant difference in the lattice parameters of GaN and AlN, AlxGa1-xN substrates would be preferable to either GaN or AlN for ultraviolet device applications. We have studied the growth of free-standing wurtzite AlxGa1-xN bulk crystals by plasma-assisted molecular beam epitaxy (PA-MBE). Thick wurtzite AlxGa1-xN films were grown by PA-MBE on 2-in. GaAs (111)B substrates and were removed from the GaAs substrate after growth to provide free standing AlxGa1-xN samples. X-ray microanalysis measurements confirm that the AlN fraction is uniform across the wafer and mass spectroscopy measurements show that the composition is also uniform in depth. We have demonstrated that free-standing wurtzite AlxGa1-xN wafers can be achieved by PA-MBE for a wide range of AlN fractions. In order to develop a commercially viable process for the growth of wurtzite AlxGa1-xN substrates, we have used a novel Riber plasma source and have demonstrated growth rates of GaN up to 1.8 μm/h on 2-in. diameter GaAs and sapphire wafers.

  17. Atomic layer epitaxy of group 4 materials: Surface processes, thin films, devices and their characterization

    NASA Astrophysics Data System (ADS)

    Davis, Robert F.; Bedair, S.; El-Masry, N. A.; Glass, J. T.; King, S.

    1994-12-01

    Residual surface contaminants were removed from vicinal 6H-SiC(0001) surfaces in UHV via high temperature annealing in SiH4. Characterization via AES, EELS, LEED, XPS, and UPS was conducted. At T greater than 850 C, the surface oxide was rapidly removed. Exposure to approx. 400 Langmuir (10(exp -6) Torr(dot)liter/s) of SiH4 resulted in complete surface oxide removal and a nearly stoichiometric (l x l) 6H-SiC surface suitable for ALE of SiC. Further exposure resulted in a (3 x 3)R30 deg Si-rich reconstructed surface. Subsequent annealing in UHV resulted in a (square root of 3 x square root of 3)R30 deg Si deficient/graphitic reconstructed surface. The first set of wafers containing HBT device structures were fabricated on SiC films grown via ALE. No transistor activity was detected. Electrical characterization and SEM showed the most likely fault to be inaccurate etching of the SiC emitter. Nucleation and growth of oriented diamond particles on seeded, group of zone axes (0001) oriented single crystal Co substrates was achieved via multi-step, hot-filament CVD process involving seeding, annealing, nucleation and growth. Diamond particles oriented group of zone axes (111) were obtained. Micro-Raman showed a FWHM of 4.3/cm. A very weak graphitic peak was observed on regions of the substrate not covered by the diamond particles. A nucleation model has been proposed. Initial results showed that CeO2 film grows epitaxially on (111) Si substrates. The CeO2 films had density of interfacial traps and fixed oxide charge values comparable to that of amorphous SiO2/Si.

  18. Effect of Substrate Surface Defects and Te Dopant Concentration on Crystalline Quality and Electrical Characteristics of AlGaAsSb Epitaxial Layers

    SciTech Connect

    H Ehsani; N Lewis; G Nichols; L Danielson; M Dashiell; Z Shellenbarger; C Wang

    2006-01-04

    The influence of GaSb substrate surface defects such as native oxides on the crystalline quality of epitaxial layers was investigated using transmission electron microscopy (TEM). Cross sectional TEM imaging showed that there are discrete defects at the GaSb-substrate/epilayer interface. Secondary ion mass spectroscopy (SIMS) results revealed high oxygen concentration at the interface, indicating that the defects are likely oxides and presumed to be native oxides since other impurities were not detected. High resolution TEM micrographs showed that the subsequent growth of the epilayer continues beyond the defects without any additional defect generation or propagation. Tellurium doped AlGaAsSb epitaxial layers were grown lattice-matched on GaSb substrates and lattice-mismatched on semi-insulating GaAs substrates by organometallic vapor phase epitaxy. Secondary ion mass spectroscopy and Hall data showed that the ratio of carrier concentration to Te concentration decreases significantly when the carrier concentration increases from 2.5 x 10{sup 17} cm{sup -3} to 6.5 x 10{sup 17} cm{sup -3}. TEM imaging showed that the material with heavily doped Te generates a high density (about 10{sup 8} cm{sup 2}) of planar defects (stacking fault) located on (111) planes. Most of the Te-related defects originate at the GaSb buffer layer/AlGaAsSb epilayer interface. In addition, discrete precipitates were observed in the heavily doped AlGaAsSb layer.

  19. About the strain state of different metal oxide layers epitaxially grown on Si(1 1 1)

    NASA Astrophysics Data System (ADS)

    Zaumseil, P.; Schroeder, T.

    2011-02-01

    The strain state of metal oxides Pr2O3, Y2O3 and Sc2O3 used as buffer material in different heteroepitaxially grown semiconductor-oxide-Si(1 1 1) layer stacks was studied by x-ray diffraction techniques at room temperature (RT) and near the growth temperature of 625 °C. A broad spectrum of different strain states was found depending on preparation conditions, layer combination and layer thickness. Pr2O3 behaves differently from the other two investigated oxides as it grows in a hexagonal phase on Si(1 1 1) and must be transformed into the stable cubic phase by annealing processes. This transformation is accompanied by the creation of an amorphous silicate interface layer that leads to a decoupling of substrate and oxide lattices and finally to a partial relaxation of the cub-Pr2O3 layer only. High-temperature measurements demonstrate that there exists a measurable difference between the strain state at RT, where x-ray measurements are typically performed, and at growth temperature. The coefficient of thermal expansion of different metal oxides was measured in thin film structures for the first time. These coefficients are significantly higher compared with that of Si, which leads to an additional tensile strain component when the samples are cooled down to RT.

  20. Effects of Seed Layer on YBa2Cu3Ox Films Grown by Liquid Phase Epitaxy

    NASA Astrophysics Data System (ADS)

    Zama, Hideaki; Miyakoshi, Masayuki; Yamamoto, Hiroshi; Morishita, Tadataka

    1999-11-01

    Crack-free YBa2Cu3Ox (YBCO) films were grown by liquid phaseepitaxy (LPE) on MgO(100) substrates with a YBCO seed layer. Thecrystalline property of LPE was crucially dependent on that of theseed layer. On the purely c-axis-oriented seed layer, reasonable YBCOfilms were grown with a full-width at half maximum of the (005)reflection rocking curve, Δω, of 0.07°. In the case of the seedincluding an a-axis-oriented grain, the value of Δω of LPE films waspoor in reproducibility and larger than 0.1° on average. For thea-axis-oriented seed, no YBCO films grew under the growth conditionsin this study. X-ray topographic observations revealed that thecrystalline quality of MgO substrates limited the Δω of LPE films grownon them.

  1. Microstructure of GaN epitaxy on SiC using AlN buffer layers

    SciTech Connect

    Ponce, F.A.; Krusor, B.S.; Major, J.S. Jr.; Plano, W.E.; Welch, D.F.

    1995-07-17

    The crystalline structure of GaN epilayers on (0001) SiC substrates has been studied using x-ray diffraction and transmission microscopy. The films were grown by metalorganic chemical vapor deposition, using AlN buffer layers. X-ray diffraction measurements show negligible strain in the epilayer, and a long-range variation in orientation. Transmission electron lattice images show that the AlN buffer layer consists of small crystallites. The nature of the buffer layer and its interfaces with the substrate and the GaN film is discussed. The defect structure of the GaN film away from the substrate consists mostly of threading dislocations with a density of {similar_to}10{sup 9} cm{sup {minus}2}. {copyright} {ital 1995} {ital American} {ital Institute} {ital of} {ital Physics}.

  2. Simple thermal diverging model of the thin epitaxial layer of InP laser diodes

    NASA Astrophysics Data System (ADS)

    Ji, Byeong-Gwan; Lee, Seung-Gol; Park, Se-Geun; O, Beom-Hoan

    2015-10-01

    With increasing use of high-power LEDs (light-emitting diodes) and LDs (laser diodes), a critical issue arises regarding their thermal design due to the increasing thermal loss and temperature, and characterizing the thermal resistance R th of the p-InP layer as a function of the layer thickness to optimize the thermal conductivity and optical loss is important. We propose a simple intuitive heat-transfer model with a diverging effective width, and the analytic form of R th (d) agrees well with the R th dataset that is simulated for most typical cases with various widths of the striped active layers and values of the p-InP thickness. Therefore, we propose a H (hyperbolic)-model that provides a simple analytic form of R th,H (d) by using only the relaxation control parameter, h, as a convenient thermal design tool for various LD systems.

  3. GaAs Solar Cells Grown by Hydride Vapor-Phase Epitaxy and the Development of GaInP Cladding Layers

    SciTech Connect

    Simon, John; Schulte, Kevin L.; Young, David L.; Haegel, Nancy M.; Ptak, Aaron J.

    2016-01-01

    The high cost of high-efficiency III-V photovoltaic devices currently limits them to niche markets. Hydride vapor-phase epitaxy (HVPE) growth of III-V materials recently reemerged as a low-cost, high-throughput alternative to conventional metal- organic vapor-phase epitaxy (MOVPE) growth of high-efficiency solar cells. Previously, we demonstrated unpassivated HVPEgrown GaAs p-n junctions with good quantum efficiency and high open-circuit voltage (Voc). In this work, we demonstrate the growth of GaInPby HVPE for use as a high-quality surface passivation layer to GaAs solar cells. Solar cells grown with GaInP window layers show significantly improved quantum efficiency compared with unpassivated cells, increasing the short-circuit current (JSC) of these low-cost devices. These results show the potential of low-cost HVPE for the growth of high-quality III-V devices.

  4. N/P InP homojunction solar cells with an In0.53Ga0.47As contacting layer grown by liquid phase epitaxy

    NASA Technical Reports Server (NTRS)

    Shen, C. C.; Choi, K. Y.

    1989-01-01

    N/P InP homojunction solar cells with an In sub 0.53 Ga sub 0.47 As contacting layer were fabricated by liquid phase epitaxy (LPE). Electron-Beam-Induced-Current (EBIC) measurements were performed on several selected samples. It was found that the background doping level in the base region sometimes results in a deep junction, which greatly affects the cell performance.

  5. Microscopic potential fluctuations in Si-doped AlGaN epitaxial layers with various AlN molar fractions and Si concentrations

    NASA Astrophysics Data System (ADS)

    Kurai, Satoshi; Miyake, Hideto; Hiramatsu, Kazumasa; Yamada, Yoichi

    2016-01-01

    Nanoscopic potential fluctuations of Si-doped AlGaN epitaxial layers with the AlN molar fraction varying from 0.42 to 0.95 and Si-doped Al0.61Ga0.39N epitaxial layers with Si concentrations of 3.0-37 × 1017 cm-3 were investigated by cathodoluminescence (CL) imaging combined with scanning electron microscopy. The spot CL linewidths of AlGaN epitaxial layers broadened as the AlN molar fraction was increased to 0.7, and then narrowed at higher AlN molar fractions. The experimental linewidths were compared with the theoretical prediction from the alloy broadening model. The trends displayed by our spot CL linewidths were consistent with calculated results at AlN molar fractions of less than about 0.60, but the spot CL linewidths were markedly broader than the calculated linewidths at higher AlN molar fractions. The dependence of the difference between the spot CL linewidth and calculated line broadening on AlN molar fraction was found to be similar to the dependence of reported S values, indicating that the vacancy clusters acted as the origin of additional line broadening at high AlN molar fractions. The spot CL linewidths of Al0.61Ga0.39N epitaxial layers with the same Al concentration and different Si concentrations were nearly constant in the entire Si concentration range tested. From the comparison of reported S values, the increase of VAl did not contribute to the linewidth broadening, unlike the case of the VAl clusters.

  6. Effect of ion irradiation on the thermal conductivity of UO2 and U3O8 epitaxial layers

    NASA Astrophysics Data System (ADS)

    Weisensee, Patricia B.; Feser, Joseph P.; Cahill, David G.

    2013-11-01

    The effect of 2 MeV Ar+-ion irradiation on the thermal conductivity of epitaxial layers of UO2 and U3O8 was studied with time-domain thermoreflectance (TDTR) at temperatures between 323 and 658 K. The thermal conductivity of unirradiated UO2 is 10.2 W m-1 K-1 at 323 K and scales with temperature like 1/T. Upon irradiation with doses >0.7 × 1015 Ar+ cm-2, the thermal conductivity decreases to a nearly constant value <4 W m-1 K. By comparing the data to an analytic model, we report the point-scattering strength of irradiation induced defects in UO2. Unirradiated U3O8 has a thermal conductivity of 1.6 W m-1 K-1 at 333 K. Low and medium doses of Ar-ion irradiation decrease the thermal conductivity of U3O8 to <1.0 W m-1 K-1. Unexpectedly, it is found that higher doses of Ar+ irradiation increased the conductivity of U3O8 to ˜2.0 W m-1 K-1.

  7. Surface photovoltage and photoluminescence study of thick Ga(In)AsN layers grown by liquid-phase epitaxy

    NASA Astrophysics Data System (ADS)

    Donchev, V.; Milanova, M.; Lemieux, J.; Shtinkov, N.; Ivanov, I. G.

    2016-03-01

    We present an experimental and theoretical study of Ga(In)AsN layers with a thickness of around 1 μm grown by liquid-phase epitaxy (LPE) on n-type GaAs substrates. The samples are studied by surface photovoltage (SPV) spectroscopy and by photoluminescence spectroscopy. Theoretical calculations of the electronic structure and the spectral dependence of the dielectric function are carried out for different nitrogen concentrations using a full-band tight-binding approach in the sp3d5s*sN parameterisation. The SPV spectra measured at room temperature clearly show a red shift of the absorption edge with respect to the absorption of the GaAs substrate. This shift, combined with the results of the theoretical calculations, allows assessing the nitrogen concentration in different samples. The latter increases with increasing the In content. The analysis of the SPV phase spectra provides information about the alignment of the energy bands across the structures. The photoluminescence measurements performed at 2 K show a red shift of the emission energy with respect to GaAs, in agreement with the SPV results.

  8. The effect of neutron irradiation and annealing temperature on the electrical properties and lattice constant of epitaxial gallium nitride layers

    SciTech Connect

    Boyko, V. M.; Verevkin, S. S.; Kolin, N. G. Korulin, A. V.; Merkurisov, D. I.; Polyakov, A. Y.; Chevychelov, V. A.

    2011-01-15

    Effect of irradiation with high reactor-neutron fluences ({Phi} = 1.5 Multiplication-Sign 10{sup 17}-8 Multiplication-Sign 10{sup 19} cm{sup -2}) and subsequent heat treatments in the temperature range 100-1000 Degree-Sign C on the electrical properties and lattice constant of epitaxial GaN layers grown on an Al{sub 2}O{sub 3} substrate is considered. It is shown that, with the neutron fluence increasing to (1-2) Multiplication-Sign 10{sup 18} cm{sup -2}, the resistivity of the material grows to values of about 10{sup 10} {Omega} cm because of the formation of radiation defects, and, with the fluence raised further, the resistivity passes through a maximum and then decreases to 2 Multiplication-Sign 10{sup 6} {Omega} cm at 300 K, which is accounted for by the appearance of a hopping conductivity via deep defects in the overlapping outer parts of disordered regions. With the neutron fluence raised to 8 Multiplication-Sign 10{sup 19} cm{sup -2}, the lattice constant c increases by 0.38% at a nearly unchanged parameter a. Heat treatment of irradiated samples at temperatures as high as 1000 Degree-Sign C does not fully restore the lattice constant and the electrical parameters of the material.

  9. High-quality InP epitaxial layers grown by metal-organic chemical vapor deposition using tertiarybutylphosphine (TBP) source

    NASA Astrophysics Data System (ADS)

    Kuan, H.; Su, Yan-Kuin; Tzou, W. J.

    1994-10-01

    One organophosphrous compound, tertiarybutylphosphine has been investigated for their possible use as precursors in the metalorganic chemical vapor deposition (MOCVD). This material is less pyrophoric and less toxic than phosphine, the compound has used to grow epitaxial layers of InP on semi-insulating InP substrate using trimethylindium (TMIn) in a flowing hydrogen ambient. High quality InP epilayer have been successfully grown and specular surface was obtained at growth temperature 600 degree(s)C and x-ray was used to measure the lattice mismatch (Delta) a/a. The highest quality InP epilayer, which was grown at a V/III ratio of 60 and a growth pressure of 250 Torr, the highest n-type electron Hall mobility were 4500 cm2/Vs with the electron concentration of 3.4 X 1015 cm-3 at 300 K and 18260 cm2/Vs with the electron concentration of 2.8 X 1015 cm-3 at 77 K. The low temperature (10 K) photoluminescence optical properties measurements show intense near bandgap emission with a full width half maximum (FWHM) is about 8 meV.

  10. Silicon layer intercalation of centimeter-scale, epitaxially grown monolayer graphene on Ru(0001)

    NASA Astrophysics Data System (ADS)

    Mao, Jinhai; Huang, Li; Pan, Yi; Gao, Min; He, Junfeng; Zhou, Haitao; Guo, Haiming; Tian, Yuan; Zou, Qiang; Zhang, Lizhi; Zhang, Haigang; Wang, Yeliang; Du, Shixuan; Zhou, Xingjiang; Castro Neto, A. H.; Gao, Hong-Jun

    2012-02-01

    We develop a strategy for graphene growth on Ru(0001) followed by silicon-layer intercalation that not only weakens the interaction of graphene with the metal substrate but also retains its superlative properties. This G/Si/Ru architecture, produced by silicon-layer intercalation approach (SIA), was characterized by scanning tunneling microscopy/spectroscopy and angle resolved electron photoemission spectroscopy. These experiments show high structural and electronic qualities of this new composite. The SIA allows for an atomic control of the distance between the graphene and the metal substrate that can be used as a top gate. Our results show potential for the next generation of graphene-based materials with tailored properties.

  11. Growth of ultrahigh-Sn-content Ge1- x Sn x epitaxial layer and its impact on controlling Schottky barrier height of metal/Ge contact

    NASA Astrophysics Data System (ADS)

    Suzuki, Akihiro; Nakatsuka, Osamu; Shibayama, Shigehisa; Sakashita, Mitsuo; Takeuchi, Wakana; Kurosawa, Masashi; Zaima, Shigeaki

    2016-04-01

    We examined the epitaxial growth of an ultrahigh-Sn-content Ge1- x Sn x layer on a Ge substrate and investigated the impact of a Ge1- x Sn x interlayer on the Schottky barrier height (SBH) of the metal/Ge contact. In this study, we considered guidelines of the strain energy and growth temperature to realize a high-Sn-content Ge1- x Sn x layer while keeping the epitaxial growth and suppressing the Sn precipitation. By reducing the film thickness and keeping a low growth temperature, we formed an atomically flat and uniform Ge1- x Sn x epitaxial layer with a Sn content up to 46% on a Ge(001) substrate. We also performed the current density-voltage measurement for Al/Ge1- x Sn x /n-Ge Schottky diodes to estimate the SBH. We found that the SBH of Al/Ge1- x Sn x /n-Ge contact decreases with increasing Sn content in the Ge1- x Sn x interlayer. The shift of the pinning position towards the conduction band edge of Ge is one of the reasons for the SBH reduction of Al/Ge1- x Sn x /n-Ge contact because the valence band edge of Ge1- x Sn x would rise as the Sn content increases.

  12. Epitaxial pentacene films grown on the surface of ion-beam-processed gate dielectric layer

    NASA Astrophysics Data System (ADS)

    Chou, W. Y.; Kuo, C. W.; Cheng, H. L.; Mai, Y. S.; Tang, F. C.; Lin, S. T.; Yeh, C. Y.; Horng, J. B.; Chia, C. T.; Liao, C. C.; Shu, D. Y.

    2006-06-01

    The following research describes the process of fabrication of pentacene films with submicron thickness, deposited by thermal evaporation in high vacuum. The films were fabricated with the aforementioned conditions and their characteristics were analyzed using x-ray diffraction, scanning electron microscopy, polarized Raman spectroscopy, and photoluminescence. Organic thin-film transistors (OTFTs) were fabricated on an indium tin oxide coated glass substrate, using an active layer of ordered pentacene molecules, which were grown at room temperature. Pentacene film was aligned using the ion-beam aligned method, which is typically employed to align liquid crystals. Electrical measurements taken on a thin-film transistor indicated an increase in the saturation current by a factor of 15. Pentacene-based OTFTs with argon ion-beam-processed gate dielectric layers of silicon dioxide, in which the direction of the ion beam was perpendicular to the current flow, exhibited a mobility that was up to an order of magnitude greater than that of the controlled device without ion-beam process; current on/off ratios of approximately 106 were obtained. Polarized Raman spectroscopy investigation indicated that the surface of the gate dielectric layer, treated with argon ion beam, enhanced the intermolecular coupling of pentacene molecules. The study also proposes the explanation for the mechanism of carrier transportation in pentacene films.

  13. A new method for the synthesis of epitaxial layers of silicon carbide on silicon owing to formation of dilatation dipoles

    NASA Astrophysics Data System (ADS)

    Kukushkin, S. A.; Osipov, A. V.

    2013-01-01

    A new method is developed for the solid-phase synthesis of epitaxial layers when the substrate itself is involved into a chemical reaction and the reaction product grows in the interior of substrate layer. It opens up new possibilities for the relaxation of the elastic energy due to attraction of point defects formed during the chemical reaction in anisotropic media. In the same time, the attracting point dilatation centers compose relatively stable formations—dilatation dipoles, named by analogy with electric dipoles, providing significant reduction of the total elastic energy. The correspondent theory of interaction of point dilatation centers in anisotropic crystals is developed. It is eliminated that the most advantageous location of the dipoles is the direction (111) in crystals with cubic symmetry. In order to confirm the theory, the single-crystal silicon carbide films with the thickness up to 200 nm have been grown on silicon (111) substrates owing to the chemical reaction with carbon monoxide. Grown high-quality single-crystal silicon carbide films do not contain misfit dislocations despite the huge lattice mismatch value of ˜20%. Also the possibility of growing of thick wide-gap semiconductor films on such templates SiC/Si(111) and, accordingly, its integration into silicon electronics, is demonstrated. In particular, a working LED structure based on gallium nitride has been produced. Finally, the thermodynamic theory of new phase nucleation due to a chemical reaction has been developed and it was shown that in the case under consideration the chemical equilibrium constant generalizes the concentration of adatoms exploited in a one-component nucleation theory.

  14. Nucleation, Growth, and Strain Relaxation of Lattice-Mismatched III-V Semiconductor Epitaxial Layers

    NASA Technical Reports Server (NTRS)

    Welser, R. E.; Guido, L. J.

    1994-01-01

    We have investigated the early stages of evolution of highly strained 2-D InAs layers and 3-D InAs islands grown by metal-organic chemical vapor deposition (MOCVD) on (100) and (111) B GaAs substrates. The InAs epilayer / GaAs substrate combination has been chosen because the lattice-mismatch is severe (approx. 7.20%), yet these materials are otherwise very similar. By examining InAs-on-GaAs composites Instead of the more common In(x)Ga(1-x)As alloy, we remove an additional degree of freedom (x) and thereby simplify data interpretation. A matrix of experiments is described in which the MOCVD growth parameters -- susceptor temperature, TMIn flux, and AsH3 flux -- have been varied over a wide range. Scanning electron microscopy, atomic force microscopy, transmission electron microscopy, and electron microprobe analysis have been employed to observe the thin film surface morphology. In the case of 3-D growth, we have extracted activation energies and power-dependent exponents that characterize the nucleation process. As a consequence, optimized growth conditions have been identified for depositing approx. 250 A thick (100) and (111)B oriented InAs layers with relatively smooth surfaces. Together with preliminary data on the strain relaxation of these layers, the above results on the evolution of thin InAs films indicate that the (111)B orientation is particularly promising for yielding lattice-mismatched films that are fully relaxed with only misfit dislocations at the epilayer / substrate interface.

  15. Nucleation, growth, and strain relaxation of lattice-mismatched 3-5 semiconductor epitaxial layers

    NASA Technical Reports Server (NTRS)

    Welser, R. E.; Guido, L. J.

    1994-01-01

    We have investigated the early stages of evolution of highly strained 2-D InAs layers and 3-D InAs islands grown by metal-organic chemical vapor deposition (MOCVD) on (100) and (111)B GaAs substrates. The InAs epilayer/GaAs substrate combination has been chosen because the lattice-mismatch is severe (approximately 7.2 percent), yet these materials are otherwise very similar. By examining InAs-on-GaAs composites instead of the more common In(x)Ga(1-x)As alloy we remove an additional degree of freedom (x) and thereby simplify data interpretation. A matrix of experiments is described in which the MOCVD growth parameters - susceptor temperature, Thin flux, and AsH3 flux - have been varied over a wide range. Scanning electron microscopy, atomic force microscopy, transmission electron microscopy, and electron microprobe analysis have been employed to observe the thin film surface morphology. In the case of 3-D growth, we have extracted activation energies and power-dependent exponents that characterize the nucleation process. As a consequence, optimized growth conditions have been identified for depositing approximately 250 A thick (100) and (111)B oriented InAs layers with relatively smooth surfaces. Together with preliminary data on the strain relaxation of these layers, the above results on the evolution of thin InAs films indicate that the (111)B orientation is particularly promising for yielding lattice-mismatched films that are fully relaxed with only misfit dislocations at the epilayer/substrate interface.

  16. Phase separation and atomic ordering in indium gallium nitride epitaxial layers

    NASA Astrophysics Data System (ADS)

    Rao, Manu

    Phase separation and atomic ordering were investigated in InGaN layers grown by metalorganic chemical vapor deposition on (0001) sapphire substrates. Transmission electron microscopy (TEM) of InGaN layers during their early stages of growth reveal 2-D quantum rings that form spontaneously. In thick layers at InN contents of 3%, planview TEM images show a random distribution of atomic species and selected area diffraction (SAD) patterns do not exhibit satellite spots continuous to Bragg reflections. InN contents of 12% result in a speckled microstructure and satellites are present in SAD patterns. No satellites are observed along the [0001] direction, implying that phase separation is two-dimensional in nature and may occur on the surface while the layer is growing. These results are indicative of composition modulations lying in the (0001) growth plane. Samples containing InN fractions of between 22 and 34% exhibit microstructures having stronger contrast variations and SAD patterns with satellites further spaced from fundamental reflections. In cross-sectional TEM images, contrast striations oriented along [0001] are present except near the InGaN/GaN interface. The spacing of these striations is comparable to the composition modulation wavelengths calculated from SADPs and decreases with increasing InN content. Similarly, plan view TEM images taken from very thin specimens exhibit a domain structure with well aligned stripes within the domains. Increasing the growth rate from 400nm/h to 900nm/h results in a reduction in the intensity of satellite spots, indicating that the amplitude of composition modulations is reduced. The absence of contrast near the InGaN/GaN interface suggest reduced In incorporation, resulting in the absence of phase separation. Reduced In incorporation is confirmed by high angle angular dark field (HAADF) imaging and energy dispersive x-ray spectroscopy (EDS). X-ray diffraction and photoluminescence data are consistent with the occurrence

  17. Atomically layer-by-layer diffusion of oxygen/hydrogen in highly epitaxial PrBaCo{sub 2}O{sub 5.5+δ} thin films

    SciTech Connect

    Bao, Shanyong; Xu, Xing; Enriquez, Erik; Mace, Brennan E.; Chen, Garry; Kelliher, Sean P.; Chen, Chonglin; Zhang, Yamei; Whangbo, Myung-Hwan; Dong, Chuang; Zhang, Qinyu

    2015-12-14

    Single-crystalline epitaxial thin films of PrBaCo{sub 2}O{sub 5.5+δ} (PrBCO) were prepared, and their resistance R(t) under a switching flow of oxidizing and reducing gases were measured as a function of the gas flow time t in the temperature range of 200–800 °C. During the oxidation cycle under O{sub 2}, the PrBCO films exhibit fast oscillations in their dR(t)/dt vs. t plots, which reflect the oxidation processes, Co{sup 2+}/Co{sup 3+} → Co{sup 3+} and Co{sup 3+} → Co{sup 3+}/Co{sup 4+}, that the Co atoms of PrBCO undergo. Each oscillation consists of two peaks, with larger and smaller peaks representing the oxygen/hydrogen diffusion through the (BaO)(CoO{sub 2})(PrO)(CoO{sub 2}) layers of PrBCO via the oxygen-vacancy-exchange mechanism. This finding paves a significant avenue for cathode materials operating in low-temperature solid-oxide-fuel-cell devices and for chemical sensors with wide range of operating temperature.

  18. Atomically layer-by-layer diffusion of oxygen/hydrogen in highly epitaxial PrBaCo2O5.5+δ thin films

    NASA Astrophysics Data System (ADS)

    Bao, Shanyong; Xu, Xing; Enriquez, Erik; Mace, Brennan E.; Chen, Garry; Kelliher, Sean P.; Chen, Chonglin; Zhang, Yamei; Whangbo, Myung-Hwan; Dong, Chuang; Zhang, Qinyu

    2015-12-01

    Single-crystalline epitaxial thin films of PrBaCo2O5.5+δ (PrBCO) were prepared, and their resistance R(t) under a switching flow of oxidizing and reducing gases were measured as a function of the gas flow time t in the temperature range of 200-800 °C. During the oxidation cycle under O2, the PrBCO films exhibit fast oscillations in their dR(t)/dt vs. t plots, which reflect the oxidation processes, Co2+/Co3+ → Co3+ and Co3+ → Co3+/Co4+, that the Co atoms of PrBCO undergo. Each oscillation consists of two peaks, with larger and smaller peaks representing the oxygen/hydrogen diffusion through the (BaO)(CoO2)(PrO)(CoO2) layers of PrBCO via the oxygen-vacancy-exchange mechanism. This finding paves a significant avenue for cathode materials operating in low-temperature solid-oxide-fuel-cell devices and for chemical sensors with wide range of operating temperature.

  19. Strain and defects in Si-doped (Al)GaN epitaxial layers

    NASA Astrophysics Data System (ADS)

    Forghani, Kamran; Schade, Lukas; Schwarz, Ulrich T.; Lipski, Frank; Klein, Oliver; Kaiser, Ute; Scholz, Ferdinand

    2012-11-01

    Si is the most common dopant in (Al)GaN based devices acting as a donor. It has been observed that Si induces tensile strain in (Al)GaN films, which leads to an increasing tendency for cracking of such films with the increase of Si content and/or the increase of Al content. Based on x-ray investigations, the Si-doped films have a larger in-plane lattice constant than their undoped buffer layers, indicating involvement of a mechanism other than the change of lattice constants expected from an alloying effect. In this work, we present a model about Si dislocation interaction while debating other proposed models in the literature. According to our model, Si atoms are attracted to the strain dipole of edge-type dislocations in (Al)GaN films. It is expected that Si is more incorporated on that side of the dislocation, which is under compression leading to the formation of off-balanced dipoles with reduced compressive component. In response to such off-balanced dipoles—appearing as tensile dominant strain dipoles—the dislocation lines climb in order to accommodate the excess tensile strain. However, this dislocation climb mechanism is hindered by forces exerted by vacancies created due to the climb process. Accordingly, we have observed a lower strain level in our Si doped layers when they contain fewer dislocations. These findings were further supported by x-ray diffraction, transmission electron microscopy, and micro-photoluminescence investigations.

  20. Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition.

    PubMed

    Lin, Edward L; Edmondson, Bryce I; Hu, Shen; Ekerdt, John G

    2016-01-01

    Atomic layer deposition (ALD) is a commercially utilized deposition method for electronic materials. ALD growth of thin films offers thickness control and conformality by taking advantage of self-limiting reactions between vapor-phase precursors and the growing film. Perovskite oxides present potential for next-generation electronic materials, but to-date have mostly been deposited by physical methods. This work outlines a method for depositing SrTiO3 (STO) on germanium using ALD. Germanium has higher carrier mobilities than silicon and therefore offers an alternative semiconductor material with faster device operation. This method takes advantage of the instability of germanium's native oxide by using thermal deoxidation to clean and reconstruct the Ge (001) surface to the 2×1 structure. 2-nm thick, amorphous STO is then deposited by ALD. The STO film is annealed under ultra-high vacuum and crystallizes on the reconstructed Ge surface. Reflection high-energy electron diffraction (RHEED) is used during this annealing step to monitor the STO crystallization. The thin, crystalline layer of STO acts as a template for subsequent growth of STO that is crystalline as-grown, as confirmed by RHEED. In situ X-ray photoelectron spectroscopy is used to verify film stoichiometry before and after the annealing step, as well as after subsequent STO growth. This procedure provides framework for additional perovskite oxides to be deposited on semiconductors via chemical methods in addition to the integration of more sophisticated heterostructures already achievable by physical methods. PMID:27501462

  1. Direct-Write Molecular Layer Epitaxy by Thermal Dip-Pen Nanolithography

    NASA Astrophysics Data System (ADS)

    Yang, M.; King, W. P.; Whitman, L. J.

    2005-03-01

    Achieving nanometer-scale control of structure in organic thin films is crucial to understand charge transport and thereby develop reliable devices such as organic FETs and LEDs. Although a variety of methods can be used to reliably deposit thin polymer films, fabrication of polymer nanostructures remains a significant challenge. We have developed a new technique, thermal dip-pen nanolithography (tDPN),^1 that can be used to directly write such nanostructures. In tDPN a custom AFM cantilever with an integral tip heater is pre-coated with a solid ``ink,'' which can then be precisely deposited onto a substrate by heating the tip above the ink’s melting temperature. Using this technique, poly(3-dodecylthiophene) nanostructures have been deposited on silicon oxide surfaces with layer-by-layer thickness control. By adjusting the tip heating power and the writing speed, we can vary the polymer thickness from a single monolayer (about 2.8 nm) to tens of monolayers with lateral dimensions <200 nm. ^1P. A. Sheehan, et al., Appl. Phys. Lett. 85, 1589 (2004).

  2. Epitaxial growth of antiphase boundary free GaAs layer on 300 mm Si(001) substrate by metalorganic chemical vapour deposition with high mobility

    NASA Astrophysics Data System (ADS)

    Alcotte, R.; Martin, M.; Moeyaert, J.; Cipro, R.; David, S.; Bassani, F.; Ducroquet, F.; Bogumilowicz, Y.; Sanchez, E.; Ye, Z.; Bao, X. Y.; Pin, J. B.; Baron, T.

    2016-04-01

    Metal organic chemical vapor deposition of GaAs on standard nominal 300 mm Si(001) wafers was studied. Antiphase boundary (APB) free epitaxial GaAs films as thin as 150 nm were obtained. The APB-free films exhibit an improvement of the room temperature photoluminescence signal with an increase of the intensity of almost a factor 2.5. Hall effect measurements show an electron mobility enhancement from 200 to 2000 cm2/V s. The GaAs layers directly grown on industrial platform with no APBs are perfect candidates for being integrated as active layers for nanoelectronic as well as optoelectronic devices in a CMOS environment.

  3. Growth of In xGa 1- xAs layers with pyramidal morphology on (1 0 0)GaAs patterned substrates by liquid-phase epitaxy

    NASA Astrophysics Data System (ADS)

    Iida, S.; Balakrishnan, K.; Koyama, T.; Hayakawa, Y.; Kumagawa, M.

    2000-05-01

    Liquid-phase epitaxial growth of In xGa 1- xAs ( x=0.6) layers on various types of patterned (1 0 0)GaAs substrates was investigated. Non-planar InGaAs layer having filled tent-like structure was grown on non-patterned substrate. When the InGaAs was grown on circular-patterned substrate, a non-hollow pyramid structure was obtained. Perfect hollow pyramid structured InGaAs was found to be grown on trench substrates of (1 0 0)GaAs.

  4. High-barrier Schottky contact on n-type 4H-SiC epitaxial layer and studies of defect levels by deep level transient spectroscopy (DLTS)

    NASA Astrophysics Data System (ADS)

    Nguyen, Khai V.; Pak, Rahmi O.; Oner, Cihan; Mannan, Mohammad A.; Mandal, Krishna C.

    2015-08-01

    High barrier Schottky contact has been fabricated on 50 μm n-type 4H-SiC epitaxial layers grown on 350 μm thick substrate 8° off-cut towards the [11̅20] direction. The 4H-SiC epitaxial wafer was diced into 10 x 10 mm2 samples. The metal-semiconductor junctions were fabricated by photolithography and dc sputtering with ruthenium (Ru). The junction properties were characterized through current-voltage (I-V) and capacitance-voltage (C-V) measurements. Detectors were characterized by alpha spectroscopy measurements in terms of energy resolution and charge collection efficiency using a 0.1 μCi 241Am radiation source. It was found that detectors fabricated from high work function rare transition metal Ru demonstrated very low leakage current and significant improvement of detector performance. Defect characterization of the epitaxial layers was conducted by deep level transient spectroscopy (DLTS) to thoroughly investigate the defect levels in the active region. The presence of a new defect level induced by this rare transition metal-semiconductor interface has been identified and characterized.

  5. Improve molecular beam epitaxy growth of HgCdTe on CdZnTe (211)B substrates using interfacial layers of HgTe/CdTe superlattices

    SciTech Connect

    Chang Yong; Grein, C. H.; Zhao, J.; Sivanathan, S.; Wang, C. Z.; Aoki, T.; Smith, David J.; Wijewarnasuriya, P. S.; Nathan, V.

    2006-12-01

    HgTe/CdTe superlattices (SLs) have been grown on CdZnTe (211)B substrates as interfacial layers to improve the reproducibility and material properties of epitaxial HgCdTe. The interfacial SL layer is found by transmission electron microscopy to be capable of smoothing out the substrate's surface roughness and to bend or block threading dislocations from propagating from the substrate into the functional HgCdTe epilayers. The best etch pit density values of 4x10{sup 4} cm{sup -2} were achieved in long-wavelength infrared HgCdTe epilayers with such interfacial layers, while typical values were in the low 10{sup 5} cm{sup -2} range. The recombination mechanisms in such layers were dominated by radiative and Auger intrinsic recombination mechanisms, whereas the contributions from the Shockley-Read-Hall mechanism become negligible, which demonstrated that the use of the SL interfacial layers was beneficial for HgCdTe growth using molecular beam epitaxy or MBE.

  6. Control of metamorphic buffer structure and device performance of InxGa1-xAs epitaxial layers fabricated by metal organic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Nguyen, H. Q.; Yu, H. W.; Luc, Q. H.; Tang, Y. Z.; Phan, V. T. H.; Hsu, C. H.; Chang, E. Y.; Tseng, Y. C.

    2014-12-01

    Using a step-graded (SG) buffer structure via metal-organic chemical vapor deposition, we demonstrate a high suitability of In0.5Ga0.5As epitaxial layers on a GaAs substrate for electronic device application. Taking advantage of the technique’s precise control, we were able to increase the number of SG layers to achieve a fairly low dislocation density (˜106 cm-2), while keeping each individual SG layer slightly exceeding the critical thickness (˜80 nm) for strain relaxation. This met the demanded but contradictory requirements, and even offered excellent scalability by lowering the whole buffer structure down to 2.3 μm. This scalability overwhelmingly excels the forefront studies. The effects of the SG misfit strain on the crystal quality and surface morphology of In0.5Ga0.5As epitaxial layers were carefully investigated, and were correlated to threading dislocation (TD) blocking mechanisms. From microstructural analyses, TDs can be blocked effectively through self-annihilation reactions, or hindered randomly by misfit dislocation mechanisms. Growth conditions for avoiding phase separation were also explored and identified. The buffer-improved, high-quality In0.5Ga0.5As epitaxial layers enabled a high-performance, metal-oxide-semiconductor capacitor on a GaAs substrate. The devices displayed remarkable capacitance-voltage responses with small frequency dispersion. A promising interface trap density of 3 × 1012 eV-1 cm-2 in a conductance test was also obtained. These electrical performances are competitive to those using lattice-coherent but pricey InGaAs/InP systems.

  7. Thermal expansion of gallium arsenide layers grown by molecular beam epitaxy at low temperatures

    NASA Astrophysics Data System (ADS)

    Leszczynski, M.; Walker, J. F.

    1993-03-01

    The thermal expansion of low-temperature (190-220 °C) MBE grown gallium arsenide (LT GaAs) was measured using x-ray diffraction methods. The experiment was performed in order to observe the influence of high nonstoichiometric excess (about 1%) of arsenic on the thermal expansion of gallium arsenide. The diffraction measurements enabled the simultaneous monitoring of the lattice constants of the LT GaAs layers and their semi-insulating GaAs substrates. Their lattice mismatch was only slightly temperature dependent and decreased by about 5% with a temperature rise from 77 K (in dark) up to 550 K. This means that the value of the thermal expansion coefficient of as-grown LT GaAs was lower only by about 0.05×10-6 K-1 than that of the semi-insulating GaAs substrate. Reduction of arsenic excess by air annealing at 420 °C resulted in the decrease of lattice mismatch and the difference in the thermal expansion. This means that both are related to such point defects as arsenic antisites and interstitials. The experimental results are compared with the previously published data for variously doped gallium arsenide samples.

  8. Investigation of ZnO thin films deposited on ferromagnetic metallic buffer layer by molecular beam epitaxy toward realization of ZnO-based magnetic tunneling junctions

    SciTech Connect

    Belmoubarik, M.; Nozaki, T.; Sahashi, M.; Endo, H.

    2013-05-07

    Deposition of ZnO thin films on a ferromagnetic metallic buffer layer (Co{sub 3}Pt) by molecular beam epitaxy technique was investigated for realization of ZnO-based magnetic tunneling junctions with good quality hexagonal ZnO films as tunnel barriers. For substrate temperature of 600 Degree-Sign C, ZnO films exhibited low oxygen defects and high electrical resistivity of 130 {Omega} cm. This value exceeded that of hexagonal ZnO films grown by sputtering technique, which are used as tunnel barriers in ZnO-MTJs. Also, the effect of oxygen flow during deposition on epitaxial growth conditions and Co{sub 3}Pt surface oxidation was discussed.

  9. Carbon Doping of Compound Semiconductor Epitaxial Layers Grown by Metalorganic Chemical Vapor Deposition Using Carbon Tetrachloride.

    NASA Astrophysics Data System (ADS)

    Cunningham, Brian Thomas

    1990-01-01

    A dilute mixture of CCl_4 in high purity H_2 has been used as a carbon dopant source for rm Al_ {x}Ga_{1-x}As grown by low pressure metalorganic chemical vapor deposition (MOCVD). To understand the mechanism for carbon incorporation from CCl_4 doping and to provide experimental parameters for the growth of carbon doped device structures, the effects of various crystal growth parameters on CCl _4 doping have been studied, including growth temperature, growth rate, V/III ratio, Al composition, and CCl_4 flow rate. Although CCl _4 is an effective p-type dopant for MOCVD rm Al_{x}Ga_ {1-x}As, injection of CCl_4 into the reactor during growth of InP resulted in no change in the carrier concentration or carbon concentration. Abrupt, heavy carbon doping spikes in GaAs have been obtained using CCl_4 without a dopant memory effect. By annealing samples with carbon doping spikes grown within undoped, n-type, and p-type GaAs, the carbon diffusion coefficient in GaAs at 825 ^circC has been estimated and has been found to depend strongly on the GaAs background doping. Heavily carbon doped rm Al_{x}Ga _{1-x}As/GaAs superlattices have been found to be more stable against impurity induced layer disordering (IILD) than Mg or Zn doped superlattices, indicating that the low carbon diffusion coefficient limits the IILD process. Carbon doping has been used in the base region on an Npn AlGaAs/GaAs heterojunction bipolar transistor (HBT). Transistors with 3 x 10 μm self-aligned emitter fingers have been fabricated which exhibit a current gain cutoff frequency of f_ {rm t} = 26 GHz.

  10. Growth of a delta-doped silicon layer by molecular beam epitaxy on a charge-coupled device for reflection-limited ultraviolet quantum efficiency

    NASA Technical Reports Server (NTRS)

    Hoenk, Michael E.; Grunthaner, Paula J.; Grunthaner, Frank J.; Terhune, R. W.; Fattahi, Masoud; Tseng, Hsin-Fu

    1992-01-01

    Low-temperature silicon molecular beam epitaxy is used to grow a delta-doped silicon layer on a fully processed charge-coupled device (CCD). The measured quantum efficiency of the delta-doped backside-thinned CCD is in agreement with the reflection limit for light incident on the back surface in the spectral range of 260-600 nm. The 2.5 nm silicon layer, grown at 450 C, contained a boron delta-layer with surface density of about 2 x 10 exp 14/sq cm. Passivation of the surface was done by steam oxidation of a nominally undoped 1.5 nm Si cap layer. The UV quantum efficiency was found to be uniform and stable with respect to thermal cycling and illumination conditions.

  11. Impact of growth and annealing conditions on the parameters of Ge/Si(001) relaxed layers grown by molecular beam epitaxy

    SciTech Connect

    Yurasov, D. V.; Bobrov, A. I.; Daniltsev, V. M.; Novikov, A. V.; Pavlov, D. A.; Skorokhodov, E. V.; Shaleev, M. V.; Yunin, P. A.

    2015-11-15

    Influence of the Ge layer thickness and annealing conditions on the parameters of relaxed Ge/Si(001) layers grown by molecular beam epitaxy via two-stage growth is investigated. The dependences of the threading dislocation density and surface roughness on the Ge layer thickness, annealing temperature and time, and the presence of a hydrogen atmosphere are obtained. As a result of optimization of the growth and annealing conditions, relaxed Ge/Si(001) layers which are thinner than 1 μm with a low threading dislocation density on the order of 10{sup 7} cm{sup –2} and a root mean square roughness of less than 1 nm are obtained.

  12. Effect of L1{sub 2} ordering in antiferromagnetic Ir-Mn epitaxial layer on exchange bias of FePd films

    SciTech Connect

    Chang, Y. C.; Duh, J. G. E-mail: lin.yg@nsrrc.org.tw; Hsiao, S. N. E-mail: lin.yg@nsrrc.org.tw; Liu, S. H.; Su, S. H.; Chiu, K. F.; Hsieh, W. C.; Chen, S. K.; Lin, Y. G. E-mail: lin.yg@nsrrc.org.tw; Lee, H. Y.; Sung, C. K.

    2015-05-07

    Two series of samples of single-layer IrMn and IrMn/FePd bilayer films, deposited on a single-crystal MgO substrate at different IrMn deposition temperatures (T{sub s} = 300–700 °C), were investigated using magnetron sputtering. L1{sub 2} ordering was revealed for the 30 nm-thick IrMn epitaxial (001) films with T{sub s} ≥ 400 °C, determined by synchrotron radiation x-ray diffractometry (XRD). XRD results also provide evidence of the epitaxial growth of the IrMn films on MgO substrate. Increasing T{sub s} from 400 to 700 °C monotonically increases the ordering parameter of L1{sub 2} phases from 0.17 to 0.81. An in-plane exchange bias field (H{sub eb}) of 22 Oe is obtained in a 10 nm-thick FePd film that is deposited on the disordered IrMn films. As the L1{sub 2} ordering of the IrMn layers increases, the H{sub eb} gradually decreases to 0 Oe, meaning that the exchange bias behavior vanishes. The increased surface roughness, revealed by atomic force microscopy, of the epitaxial IrMn layers with increasing T{sub s} cannot be the main cause of the decrease in H{sub eb} due to the compensated surface spins regardless of the disordered and ordered (001) IrMn layers. The change of antiferromagnetic structure from the A1 to the L1{sub 2} phase was correlated with the evolution of H{sub eb}.

  13. Effect of the Surface Morphology of Seed and Mask Layers on InP Grown on Si by Epitaxial Lateral Overgrowth

    NASA Astrophysics Data System (ADS)

    Junesand, Carl; Hu, Chen; Wang, Zhechao; Metaferia, Wondwosen; Dagur, Pritesh; Pozina, Galia; Hultman, Lars; Lourdudoss, Sebastian

    2012-09-01

    Heteroepitaxy of InP on Si by epitaxial lateral overgrowth (ELOG) using a thin seed layer of InP as starting material is investigated, with special attention given to the effect of the surface morphology of the seed and the mask layers on the quality of the ELOG layers. Chemical mechanical polishing (CMP) has been used to improve the morphological and optical quality of InP grown by hydride vapor-phase epitaxy (HVPE) using ELOG. Two approaches have been investigated: polishing the InP seed layer on Si before depositing the SiO2 mask and polishing the SiO2 mask after its deposition on the unprocessed seed layer. For polishing the InP (seed)/Si, a two-step process with an aluminum oxide- and sodium hypochlorite-containing slurry as well as a slurry based on sodium hypochlorite mixed with citric acid was used. For SiO2 mask polishing, a slurry with colloidal silica as an abrasive was employed. In both cases, the SiO2 mask was patterned with double line openings and ELOG carried out in an HVPE reactor. Morphology and crystal quality of the resulting ELOG layers were studied with atomic force microscopy (AFM) and room-temperature panchromatic cathodoluminescence (PC-CL) in situ in a scanning electron microscope (SEM), respectively. The results show that, whereas both polishing approaches result in an ELOG InP layer with good morphology, its surface roughness is lower when the InP (seed)/Si is subjected to CMP prior to deposition of the SiO2 mask, than when only the SiO2 mask is polished. This approach also leads to a decrease in the number of defects generated during coalescence of the ELOG layers.

  14. Effects of Substrate Surface Defects and Te Dopant Concentration on Crystalline Quality and Electrical Characteristics of AlGaAsSb Epitaxial Layers

    SciTech Connect

    H Ehsani; N Lewis; G Nichols; L Danielson; M Dashiell; Z Shellenbarger; C Wang

    2004-10-27

    Tellurium doped AlGaAsSb epitaxial layers were grown lattice-matched on GaSb substrates and lattice-mismatched on semi-insulating GaAs substrates by organometallic vapor phase epitaxy. Secondary ion mass spectroscopy and Hall data showed that the ratio of carrier concentration to Te concentration decreases from 40% to 5% when the Te concentration increases from 4.8 x 10{sup 17} cm{sup -3} to 1.3 x 10{sup 19} cm{sup -3}. Transmission electron microscopy (TEM) showed that the material with heavily doped Te generates a high density (about 10{sup 8} cm{sup 2}) of planar defects. Most of the Te-related defects originate at the GaSb buffer layer/AlGaAsSb epilayer interface. In addition, discrete precipitates were observed in the heavily doped AlGaAsSb layer. TEM imaging revealed amorphous defects (likely residual native oxides) along the GaSb substrate/GaSb buffer interface. High resolution TEM imaging revealed high quality growth beyond the GaSb-buffer/GaSb-substrate interfacial defects. The microstructural impact of GaSb-buffer/GaSb-substrate interface defects on the crystalline quality of AlGaAsSb layers is insignificant.

  15. Epitaxial solar cells fabrication

    NASA Technical Reports Server (NTRS)

    Daiello, R. V.; Robinson, P. H.; Kressel, H.

    1975-01-01

    Silicon epitaxy has been studied for the fabrication of solar cell structures, with the intent of optimizing efficiency while maintaining suitability for space applications. SiH2CL2 yielded good quality layers and junctions with reproducible impurity profiles. Diode characteristics and lifetimes in the epitaxial layers were investigated as a function of epitaxial growth conditions and doping profile, as was the effect of substrates and epitaxial post-gettering on lifetime. The pyrolytic decomposition of SiH4 was also used in the epitaxial formation of highly doped junction layers on bulk Si wafers. The effects of junction layer thickness and bulk background doping level on cell performance, in particular, open-circuit voltage, were investigated. The most successful solar cells were fabricated with SiH2 CL2 to grow p/n layers on n(+) substrates. The best performance was obtained from a p(+)/p/n/n(+) structure grown with an exponential grade in the n-base layer.

  16. A silicon-based photocathode for water reduction with an epitaxial SrTiO3 protection layer and a nanostructured catalyst

    NASA Astrophysics Data System (ADS)

    Ji, Li; McDaniel, Martin D.; Wang, Shijun; Posadas, Agham B.; Li, Xiaohan; Huang, Haiyu; Lee, Jack C.; Demkov, Alexander A.; Bard, Allen J.; Ekerdt, John G.; Yu, Edward T.

    2015-01-01

    The rapidly increasing global demand for energy combined with the environmental impact of fossil fuels has spurred the search for alternative sources of clean energy. One promising approach is to convert solar energy into hydrogen fuel using photoelectrochemical cells. However, the semiconducting photoelectrodes used in these cells typically have low efficiencies and/or stabilities. Here we show that a silicon-based photocathode with a capping epitaxial oxide layer can provide efficient and stable hydrogen production from water. In particular, a thin epitaxial layer of strontium titanate (SrTiO3) was grown directly on Si(001) by molecular beam epitaxy. Photogenerated electrons can be transported easily through this layer because of the conduction-band alignment and lattice match between single-crystalline SrTiO3 and silicon. The approach was used to create a metal-insulator-semiconductor photocathode that, under a broad-spectrum illumination at 100 mW cm-2, exhibits a maximum photocurrent density of 35 mA cm-2 and an open circuit potential of 450 mV there was no observable decrease in performance after 35 hours of operation in 0.5 M H2SO4. The performance of the photocathode was also found to be highly dependent on the size and spacing of the structured metal catalyst. Therefore, mesh-like Ti/Pt nanostructured catalysts were created using a nanosphere lithography lift-off process and an applied-bias photon-to-current efficiency of 4.9% was achieved.

  17. GaN Epitaxial Layer Grown with Conductive Al(x)Ga(1-x)N Buffer Layer on SiC Substrate Using Metal Organic Chemical Vapor Deposition.

    PubMed

    So, Byeongchan; Lee, Kyungbae; Lee, Kyungjae; Heo, Cheon; Pyeon, Jaedo; Ko, Kwangse; Jang, Jongjin; Nam, Okhyun

    2016-05-01

    This study investigated GaN epitaxial layer growth with a conductive Al(x)Ga(1-x)N buffer layer on n-type 4H-SiC by high-temperature metalorganic chemical vapor deposition (HT-MOCVD). The Al composition of the Al(x)Ga(1-x)N buffer was varied from 0% to 100%. In terms of the crystal quality of the GaN layer, 79% Al was the optimal composition of the Al(x)Ga(1-x)N buffer layer in our experiment. A vertical conductive structure was fabricated to measure the current voltage (I-V) characteristics as a function of Al composition, and the I-V curves showed that the resistance increased with increasing Al concentration of the Al(x)Ga(1-x)N buffer layer. PMID:27483845

  18. Growth of ZnO(0001) on GaN(0001)/4H-SiC buffer layers by plasma-assisted hybrid molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Adolph, David; Tingberg, Tobias; Ive, Tommy

    2015-09-01

    Plasma-assisted molecular beam epitaxy was used to grow ZnO(0001) layers on GaN(0001)/4H-SiC buffer layers deposited in the same growth chamber equipped with both N- and O-plasma sources. The GaN buffer layers were grown immediately before initiating the growth of ZnO. Using a substrate temperature of 445 °C and an O2 flow rate of 2.5 standard cubic centimeters per minute, we obtained ZnO layers with statistically smooth surfaces having a root-mean-square roughness of 0.3 nm and a peak-to-valley distance of 3 nm as revealed by atomic force microscopy. The full-width-at-half-maximum for x-ray rocking curves obtained across the ZnO(0002) and ZnO(10 1 bar 5) reflections was 198 and 948 arcsec, respectively. These values indicated that the mosaicity of the ZnO layer was comparable to the corresponding values of the underlying GaN buffer layer. Reciprocal space maps showed that the in-plane relaxation of the GaN and ZnO layers was 82% and 73%, respectively, and that the relaxation occurred abruptly during the growth. Room-temperature Hall-effect measurements revealed that the layers were inherently n-type and had an electron concentration of 1×1019 cm-3 and a Hall mobility of 51 cm2/V s.

  19. Growth of Ge1-xSnx/Ge strained-layer superlattices on Si(1 0 0) by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Su, Shaojian; Zhang, Dongliang; Zhang, Guangze; Xue, Chunlai; Cheng, Buwen

    2013-12-01

    Low-temperature molecular beam epitaxy was employed to grow Ge1-xSnx/Ge strained-layer superlattices (SLSs) on Si(1 0 0) substrates with a Ge buffer layer. The Ge1-xSnx and Ge layers in the SLSs were deposited at the same temperature as low as 180 °C. Surface roughening during the growth was investigated by in situ reflection high-energy electron diffraction (RHEED). The periods, compositions, and quality of the SLSs were characterized by high resolution X-ray diffraction (HR-XRD), random and aligned Rutherford backscattering spectra (RBS), transmission electron microscopy (TEM), and scanning TEM. Besides, a Ge1-xSnx/Ge SLS sample was grown directly on Si(1 0 0) for comparison. It’s found that the quality of the Ge1-xSnx/Ge SLSs grown on a Ge buffer was significantly better than that grown directly on Si(1 0 0) substrate.

  20. Determination of the thickness and spectral dependence of the refractive index of Al{sub x}In{sub 1-x}Sb epitaxial layers from reflectance spectra

    SciTech Connect

    Komkov, O. S. Firsov, D. D.; Semenov, A. N.; Meltser, B. Ya.; Troshkov, S. I.; Pikhtin, A. N.; Ivanov, S. V.

    2013-02-15

    A nondestructive method for measuring the thicknesses of epitaxial layers of Al{sub x}In{sub 1-x}Sb alloys based on interference effects in reflectance spectra measured in a wide wavelength range (1-28 {mu}m) is implemented. The studied 0.9-3.3 {mu}m thick Al{sub x}In{sub 1-x}Sb layers are grown on highly lattice-mismatched GaAs substrates by molecular beam epitaxy. The found thicknesses are in good agreement with the independent data of scanning electron microscopy. The spectral dependence of the refractive index n(E) of Al{sub x}In{sub 1-x}Sb layers is measured both for the regions of transparency and fundamental absorption. The refractive index for the case of E < E{sub 0} was calculated by a double-oscillator model using a refined experimental dependence of the band gap on the composition E{sub 0}(x). The experimental data on the n(E) of Al{sub x}In{sub 1-x}Sb for energies E > E{sub 0} are found based on the interference pattern.

  1. Structural and magnetic properties of GaMnAs layers with high Mn-content grown by migration-enhanced epitaxy on GaAs(100) substrates

    NASA Astrophysics Data System (ADS)

    Sadowski, J.; Mathieu, R.; Svedlindh, P.; Domagała, J. Z.; Bak-Misiuk, J.; Światek, K.; Karlsteen, M.; Kanski, J.; Ilver, L.; Åsklund, H.; Södervall, U.

    2001-05-01

    Ferromagnetic GaMnAs containing up to 10% Mn has been grown by migration-enhanced epitaxy at a substrate temperature of 150 °C. The lattice constant of hypothetical zinc-blende structure MnAs is determined to be 5.90 Å, which deviates somewhat from previously reported values. This deviation is ascribed to growth-condition-dependent density of point defects. Magnetization measurements showed an onset of ferromagnetic ordering around 75 K for the GaMnAs layer with 10% Mn. This means that the trend of falling Curie temperatures with increasing Mn concentrations above 5.3% is broken.

  2. Epitaxial stabilization of (110)-layered perovskites of the RE{sub 2}Ti{sub 2}O{sub 7} (RE=La, Nd, Sm, Gd) family

    SciTech Connect

    Havelia, S.; Wang, S.; Balasubramaniam, K.R.; Salvador, P.A.

    2009-07-15

    Thin films of RE{sub 2}Ti{sub 2}O{sub 7} (RE=La, Nd, Sm, Gd) were deposited on single crystal SrTiO{sub 3} (110) substrates at 900 deg. C using pulsed laser deposition. X-ray diffraction (XRD) results showed sharp (00k) peaks (in theta-2theta scans) with narrow rocking curves (omega-scan peak widths of 0.4-0.9{sup o}), indicating that all compositions adopted the (110)-layered perovskite structure. While this is the stable structure for RE=La and Nd, it is metastable for RE=Sm and Gd. The metastable compounds are formed directly through epitaxial stabilization at these high temperatures and are shown to be isostructural to monoclinic La{sub 2}Ti{sub 2}O{sub 7}. The a, b, and c lattice parameters decreased monotonically with decreasing size of the RE cation, while the monoclinic angle remained fairly constant. The epitaxial relationship between the (110)-layered RE{sub 2}Ti{sub 2}O{sub 7} films and the SrTiO{sub 3}(110) substrate was found by XRD and transmission electron microscopy to be {l_brace}001{r_brace}<010>{sub film}||{l_brace}110{r_brace}<11-bar0>{sub SrTiO{sub 3}}. The single-phase, metastable, epitaxial, 100 nm thick films maintained the layered perovskite structure even after annealing at 900 deg. C for two hours in 200 Torr of oxygen. - Graphical abstract: Epitaxial thin films of RE{sub 2}Ti{sub 2}O{sub 7} (RE=Gd, Sm, Nd, and La) were deposited on single crystal SrTiO{sub 3} (110) substrates using pulsed laser deposition (PLD). All compositions adopted the monoclinic (110)-layered perovskite structure, which is the stable phase for La{sub 2}Ti{sub 2}O{sub 7} and Nd{sub 2}Ti{sub 2}O{sub 7} but is metastable with respect to the pyrochlore phase for Sm{sub 2}Ti{sub 2}O{sub 7} and Gd{sub 2}Ti{sub 2}O{sub 7}.

  3. A visualization of threading dislocations formation and dynamics in mosaic growth of GaN-based light emitting diode epitaxial layers on (0001) sapphire

    NASA Astrophysics Data System (ADS)

    Ravadgar, P.; Horng, R. H.; Ou, S. L.

    2012-12-01

    A clear visualization of the origin and characteristics of threading dislocations (TDs) of GaN-based light emitting diode epitaxial layers on (0001) sapphire substrates have been carried out. Special experimental set up and chemical etchant along with field emission scanning electron microscopy are employed to study the dynamics of GaN TDs at different growth stages. Cross-sectional transmission electron microscopy analysis visualized the formation of edge TDs is arising from extension of coalescences at boundaries of different tilting-twining nucleation grains "mosaic growth." Etch pits as representatives of edge TDs are in agreement with previous theoretical models and analyses of TDs core position and characteristics.

  4. Characterization of Stress Relaxation, Dislocations and Crystallographic Tilt Via X-ray Microdiffraction in GaN (0001) Layers Grown by Maskless Pendeo-Epitaxy

    SciTech Connect

    Barabash, R.I.; Ice, G.E.; Liu, W.; Einfeldt, S.; Hommel, D.; Roskowski, A.M.; Davis, R.F.

    2010-06-25

    Intrinsic stresses due to lattice mismatch and high densities of threading dislocations and extrinsic stresses resulting from the mismatch in the coefficients of thermal expansion are present in almost all III-Nitride heterostructures. Stress relaxation in the GaN layers occurs in conventional and in pendeo-epitaxial films via the formation of additional misfit dislocations, domain boundaries, elastic strain and wing tilt. Polychromatic X-ray microdiffraction, high resolution monochromatic X-ray diffraction and finite element simulations have been used to determine the distribution of strain, dislocations, sub-boundaries and crystallographic wing tilt in uncoalesced and coalesced GaN layers grown by maskless pendeo-epitaxy. An important parameter was the width-to-height ratio of the etched columns of GaN from which the lateral growth of the wings occurred. The strain and tilt across the stripes increased with the width-to-height ratio. Tilt boundaries formed in the uncoalesced GaN layers at the column/wing interfaces for samples with a large ratio. Sharper tilt boundaries were observed at the interfaces formed by the coalescence of two laterally growing wings. The wings tilted upward during cooling to room temperature for both the uncoalesced and the coalesced GaN layers. It was determined that finite element simulations that account for extrinsic stress relaxation can explain the experimental results for uncoalesced GaN layers. Relaxation of both extrinsic and intrinsic stress components in the coalesced GaN layers contribute to the observed wing tilt and the formation of sub-boundaries.

  5. Characterization of Stress Relaxation, Dislocations and Crystallographic Tilt Via X-ray Microdiffraction in GaN (0001) Layers Grown by Maskless Pendeo-Epitaxy

    SciTech Connect

    Barabash, Rozaliya; Ice, Gene E; Liu, Wenjun; Einfeldt, S.; Hommel, D.; Roskowski, A. M.; Davis, R. F.

    2005-01-01

    Intrinsic stresses due to lattice mismatch and high densities of threading dislocations and extrinsic stresses resulting from the mismatch in the coefficients of thermal expansion are present in almost all III-Nitride heterostructures. Stress relaxation in the GaN layers occurs in conventional and in pendeo-epitaxial films via the formation of additional misfit dislocations, domain boundaries, elastic strain and wing tilt. Polychromatic X-ray microdiffraction, high resolution monochromatic X-ray diffraction and finite element simulations have been used to determine the distribution of strain, dislocations, sub-boundaries and crystallographic wing tilt in uncoalesced and coalesced GaN layers grown by maskless pendeo-epitaxy. An important parameter was the width-to-height ratio of the etched columns of GaN from which the lateral growth of the wings occurred. The strain and tilt across the stripes increased with the width-to-height ratio. Tilt boundaries formed in the uncoalesced GaN layers at the column/wing interfaces for samples with a large ratio. Sharper tilt boundaries were observed at the interfaces formed by the coalescence of two laterally growing wings. The wings tilted upward during cooling to room temperature for both the uncoalesced and the coalesced GaN layers. It was determined that finite element simulations that account for extrinsic stress relaxation can explain the experimental results for uncoalesced GaN layers. Relaxation of both extrinsic and intrinsic stress components in the coalesced GaN layers contribute to the observed wing tilt and the formation of sub-boundaries.

  6. Deep levels in a-plane, high Mg-content Mg{sub x}Zn{sub 1-x}O epitaxial layers grown by molecular beam epitaxy

    SciTech Connect

    Guer, Emre; Tabares, G.; Hierro, A.; Chauveau, J. M.

    2012-12-15

    Deep level defects in n-type unintentionally doped a-plane Mg{sub x}Zn{sub 1-x}O, grown by molecular beam epitaxy on r-plane sapphire were fully characterized using deep level optical spectroscopy (DLOS) and related methods. Four compositions of Mg{sub x}Zn{sub 1-x}O were examined with x = 0.31, 0.44, 0.52, and 0.56 together with a control ZnO sample. DLOS measurements revealed the presence of five deep levels in each Mg-containing sample, having energy levels of E{sub c} - 1.4 eV, 2.1 eV, 2.6 V, and E{sub v} + 0.3 eV and 0.6 eV. For all Mg compositions, the activation energies of the first three states were constant with respect to the conduction band edge, whereas the latter two revealed constant activation energies with respect to the valence band edge. In contrast to the ternary materials, only three levels, at E{sub c} - 2.1 eV, E{sub v} + 0.3 eV, and 0.6 eV, were observed for the ZnO control sample in this systematically grown series of samples. Substantially higher concentrations of the deep levels at E{sub v} + 0.3 eV and E{sub c} - 2.1 eV were observed in ZnO compared to the Mg alloyed samples. Moreover, there is a general invariance of trap concentration of the E{sub v} + 0.3 eV and 0.6 eV levels on Mg content, while at least and order of magnitude dependency of the E{sub c} - 1.4 eV and E{sub c} - 2.6 eV levels in Mg alloyed samples.

  7. Surface passivation and interface properties of bulk GaAs and epitaxial-GaAs/Ge using atomic layer deposited TiAlO alloy dielectric.

    PubMed

    Dalapati, G K; Chia, C K; Tan, C C; Tan, H R; Chiam, S Y; Dong, J R; Das, A; Chattopadhyay, S; Mahata, C; Maiti, C K; Chi, D Z

    2013-02-01

    High quality surface passivation on bulk-GaAs substrates and epitaxial-GaAs/Ge (epi-GaAs) layers were achieved by using atomic layer deposited (ALD) titanium aluminum oxide (TiAlO) alloy dielectric. The TiAlO alloy dielectric suppresses the formation of defective native oxide on GaAs layers. X-ray photoelectron spectroscopy (XPS) analysis shows interfacial arsenic oxide (As(x)O(y)) and elemental arsenic (As) were completely removed from the GaAs surface. Energy dispersive X-ray diffraction (EDX) analysis and secondary ion mass spectroscopy (SIMS) analysis showed that TiAlO dielectric is an effective barrier layer for reducing the out-diffusion of elemental atoms, enhancing the electrical properties of bulk-GaAs based metal-oxide-semiconductor (MOS) devices. Moreover, ALD TiAlO alloy dielectric on epi-GaAs with AlGaAs buffer layer realized smooth interface between epi-GaAs layers and TiAlO dielectric, yielding a high quality surface passivation on epi-GaAs layers, much sought-after for high-speed transistor applications on a silicon platform. Presence of a thin AlGaAs buffer layer between epi-GaAs and Ge substrates improved interface quality and gate dielectric quality through the reduction of interfacial layer formation (Ga(x)O(y)) and suppression of elemental out-diffusion (Ga and As). The AlGaAs buffer layer and TiAlO dielectric play a key role to suppress the roughening, interfacial layer formation, and impurity diffusion into the dielectric, which in turn largely enhances the electrical property of the epi-GaAs MOS devices. PMID:23331503

  8. Epitaxial c-axis oriented BaTiO{sub 3} thin films on SrTiO{sub 3}-buffered Si(001) by atomic layer deposition

    SciTech Connect

    Ngo, Thong Q.; McDaniel, Martin D.; Ekerdt, John G.; Posadas, Agham B.; Demkov, Alexander A.; Hu, Chengqing; Yu, Edward T.; Bruley, John

    2014-02-24

    Atomic layer deposition (ALD) of epitaxial c-axis oriented BaTiO{sub 3} (BTO) on Si(001) using a thin (1.6 nm) buffer layer of SrTiO{sub 3} (STO) grown by molecular beam epitaxy is reported. The ALD growth of crystalline BTO films at 225  °C used barium bis(triisopropylcyclopentadienyl), titanium tetraisopropoxide, and water as co-reactants. X-ray diffraction (XRD) reveals a high degree of crystallinity and c-axis orientation of as-deposited BTO films. Crystallinity is improved after vacuum annealing at 600  °C. Two-dimensional XRD confirms the tetragonal structure and orientation of 7–20-nm thick films. The effect of the annealing process on the BTO structure is discussed. A clean STO/Si interface is found using in-situ X-ray photoelectron spectroscopy and confirmed by cross-sectional scanning transmission electron microscopy. The capacitance-voltage characteristics of 7–20 nm-thick BTO films are examined and show an effective dielectric constant of ∼660 for the heterostructure.

  9. Reduction of structural defects in thick 4H-SiC epitaxial layers grown on 4° off-axis substrates

    NASA Astrophysics Data System (ADS)

    Yazdanfar, M.; Ivanov, I. G.; Pedersen, H.; Kordina, O.; Janzén, E.

    2013-06-01

    By carefully controlling the surface chemistry of the chemical vapor deposition process for silicon carbide (SiC), 100 μm thick epitaxial layers with excellent morphology were grown on 4° off-axis SiC substrates at growth rates exceeding 100 μm/h. In order to reduce the formation of step bunching and structural defects, mainly triangular defects, the effect of varying parameters such as growth temperature, C/Si ratio, Cl/Si ratio, Si/H2 ratio, and in situ pre-growth surface etching time are studied. It was found that an in-situ pre growth etch at growth temperature and pressure using 0.6% HCl in hydrogen for 12 min reduced the structural defects by etching preferentially on surface damages of the substrate surface. By then applying a slightly lower growth temperature of 1575 °C, a C/Si ratio of 0.8, and a Cl/Si ratio of 5, 100 μm thick, step-bunch free epitaxial layer with a minimum triangular defect density and excellent morphology could be grown, thus enabling SiC power device structures to be grown on 4° off axis SiC substrates.

  10. Inhomogeneous distribution of defect-related emission in Si-doped AlGaN epitaxial layers with different Al content and Si concentration

    SciTech Connect

    Kurai, Satoshi Ushijima, Fumitaka; Yamada, Yoichi; Miyake, Hideto; Hiramatsu, Kazumasa

    2014-02-07

    The spatial distribution of luminescence in Si-doped AlGaN epitaxial layers that differ in Al content and Si concentration has been studied by cathodoluminescence (CL) mapping in combination with scanning electron microscopy. The density of surface hillocks increased with decreasing Al content and with increasing Si concentration. The mechanisms giving rise to those hillocks are likely different. The hillocks induced surface roughening, and the compositional fluctuation and local donor-acceptor-pair (DAP) emission at hillock edges in AlGaN epitaxial layers were enhanced irrespective of the origin of the hillocks. The intensity of local DAP emission was related to Si concentration, as well as to hillock density. CL observation revealed that DAP emission areas were present inside the samples and were likely related to dislocations concentrated at hillock edges. Possible candidates for acceptors in the observed DAP emission that are closely related in terms of both Si concentration and hillock edges with large deformations are a V{sub III}-Si{sub III} complex and Si{sub N}, which are unfavorable in ordinary III-nitrides.

  11. Giant magnetoresistive structures based on CrO{sub 2} with epitaxial RuO{sub 2} as the spacer layer

    SciTech Connect

    Miao, G.X.; Gupta, A.; Sims, H.; Butler, W.H.; Ghosh, S.; Xiao Gang

    2005-05-15

    Epitaxial ruthenium dioxide (RuO{sub 2})/chromium dioxide(CrO{sub 2}) thin film heterostructures have been grown on (100)-TiO{sub 2} substrates by chemical vapor deposition. Both current-in-plane (CIP) and current-perpendicular-to-plane (CPP) giant magnetoresistive stacks were fabricated with either Co or another epitaxial CrO{sub 2} layer as the top electrode. The Cr{sub 2}O{sub 3} barrier, which forms naturally on CrO{sub 2} surfaces, is no longer present after the RuO{sub 2} deposition, resulting in a highly conductive interface that has a resistance at least four orders of magnitude lower. However, only very limited magnetoresistance (MR) was observed. Such low MR is due to the appearance of a chemically and magnetically disordered layer at the CrO{sub 2} and RuO{sub 2} interfaces when Cr{sub 2}O{sub 3} is transformed into rutile structures during its intermixing with RuO{sub 2}.

  12. Preparation of GaAs and Ga1-xAlxAs Multi-Layer Structures by Metalorganic Molecular Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Tokumitsu, Eisuke; Katoh, Toshiaki; Kimura, Ryuhei; Konagai, Makoto; Takahashi, Kiyoshi

    1986-08-01

    Metalorganic molecular beam epitaxial (MOMBE) growth of GaAs and (GaAl)As using triethylgallium (TEG) and triethylaluminum (TEA) has been studied. N-GaAs/p-GaAs multi-layer structures were prepared by applying an alternating ionization voltage to hydrogen. Single-crystal Ga1-xAlxAs ternary alloy with good surface mophology was successfully grown by introducing TEA as an Al source. The epitaxial layers typically showed p-type conduction with a carrier concentration of more than 1018 cm-3, this being due to residual carbon. A (GaAl)As/GaAs multiquantum well (MQW) heterostructure was fabricated by switching TEA and it was observed that the photoluminescence peak energies from the MQW structures were shifted to the higher energy position. Furthermore, selective growth of GaAs and (GaAl)As on a partly SiO2 masked GaAs substrate was investigated. In the MOMBE growth of (GaAl)As, polycrystalline film was deposited on the SiO2 masked region, while no deposition took place in the growth of GaAs.

  13. EDITORIAL: Epitaxial graphene Epitaxial graphene

    NASA Astrophysics Data System (ADS)

    de Heer, Walt A.; Berger, Claire

    2012-04-01

    Graphene is widely regarded as an important new electronic material with interesting two-dimensional electron gas properties. Not only that, but graphene is widely considered to be an important new material for large-scale integrated electronic devices that may eventually even succeed silicon. In fact, there are countless publications that demonstrate the amazing applications potential of graphene. In order to realize graphene electronics, a platform is required that is compatible with large-scale electronics processing methods. It was clear from the outset that graphene grown epitaxially on silicon carbide substrates was exceptionally well suited as a platform for graphene-based electronics, not only because the graphene sheets are grown directly on electronics-grade silicon carbide (an important semiconductor in its own right), but also because these sheets are oriented with respect to the semiconductor. Moreover, the extremely high temperatures involved in production assure essentially defect-free and contamination-free materials with well-defined interfaces. Epitaxial graphene on silicon carbide is not a unique material, but actually a class of materials. It is a complex structure consisting of a reconstructed silicon carbide surface, which, for planar hexagonal silicon carbide, is either the silicon- or the carbon-terminated face, an interfacial carbon rich layer, followed by one or more graphene layers. Consequently, the structure of graphene films on silicon carbide turns out to be a rich surface-science puzzle that has been intensively studied and systematically unravelled with a wide variety of surface science probes. Moreover, the graphene films produced on the carbon-terminated face turn out to be rotationally stacked, resulting in unique and important structural and electronic properties. Finally, in contrast to essentially all other graphene production methods, epitaxial graphene can be grown on structured silicon carbide surfaces to produce graphene

  14. Spin scattering asymmetric coefficients and enhanced specific interfacial resistance of fully epitaxial current-perpendicular-to-plane giant magnetoresistance spin valves using alternate monatomic layered [Fe/Co]n and a Ag spacer layer

    NASA Astrophysics Data System (ADS)

    Jung, J. W.; Shiozaki, R.; Doi, M.; Sahashi, M.

    2011-04-01

    Using current-perpendicular-to-plane (CPP) giant magnetoresistance (GMR) measurement, we have evaluated the bulk and interface spin scattering asymmetric coefficients, βF and γF/N and the specific interfacial resistance, AR*F/N, for exchange-biased spin-valves consisting of artificially ordered B2 structure Fe50Co50 and Ag spacer layer. Artificially epitaxial ordered Fe50Co50 superlattices have been successfully fabricated on MgO (001) substrate by alternate monatomic layer (AML) deposition at a substrate temperature of 75 °C. The structural properties of the full epitaxial trilayer, AML[Fe/Co]n/Ag/AML[Fe/Co]n, on the Ag electrode have been confirmed by in situ reflection high-energy electron diffraction and transmission electron diffraction microscopy. A considerably large resistance-area product change and MR ratio (ΔRA > 3 mΩμm2 and MR ratio ˜5%) were confirmed even at thin AML[Fe/Co]n layer at room temperature (RT) in our spin-valve elements. The estimated values of βF and γF/N were 0.80 and 0.84 ± 0.02, respectively, from the Valet-Fert theory analysis of ΔRA as a function of thickness of the ferromagnetic layer (3, 4, and 5 nm) on the basis of the two-current model.

  15. Photoluminescence study of InAs quantum dots embedded in GaNAs strain compensating layer grown by metalorganic-molecular-beam epitaxy

    NASA Astrophysics Data System (ADS)

    Zhang, X. Q.; Ganapathy, Sasikala; Kumano, Hidekazu; Uesugi, Kasturi; Suemune, Ikuo

    2002-12-01

    Self-assembled InAs quantum dots (QDs) embedded in GaN0.007As0.993 strain compensating layers have been grown by metalorganic-molecular-beam epitaxy on a GaAs (001) substrate with a high density of 1×1011 cm-2. The photoluminescence properties have been studied for two periods of InAs quantum dots layers embedded in GaN0.007As0.993 strain compensating layers. Four well-resolved excited-state peaks in the photoluminescence spectra have been observed from these highly packed InAs QDs embedded in the GaN0.007As0.993 strain compensating layers. This indicates that the InAs QDs are uniformly formed and that the excited states in QDs due to the quantum confinement effect are well defined. This is explained by tensile strain in GaNAs layers instead of the usual GaAs layers to relieve the compressive strain formed in InAs QDs to keep the total strain of the system at a minimum.

  16. Investigation on the lattice site location of the excess arsenic atoms in GaAs layers grown by low temperature molecular beam epitaxy

    SciTech Connect

    Yu, Kin Man; Liliental-Weber, Z.

    1991-11-01

    We have measured the excess As atoms present in gaze layers grown by molecular beam epitaxy at low substrate temperatures using particle induced x-ray emission technique. The amount of excess As atoms in layers grown by MBE at 200{degrees}C were found to be {approximately} 4 {times} 10{sup 20} cm{sup {minus}2}. Subsequent annealing of the layers under As overpressure at 600{degrees}C did not result in any substantial As loss. However, transmission electron microscopy revealed that As precipitates (2-5nm in diameter) were present in the annealed layers. The lattice location of the excess As atoms in the as grown layers was investigated by ion channeling methods. Angular scans were performed in the <110> axis of the crystal. Our results strongly suggest that a large fraction of these excess As atoms are located in an interstitial position close to an As row. These As intersitials'' are located at a site slightly displaced from the tetrahedral site in a diamond cubic lattice. No interstitial As signal is observed in the annealed layers.

  17. Investigation on the lattice site location of the excess arsenic atoms in GaAs layers grown by low temperature molecular beam epitaxy

    SciTech Connect

    Yu, Kin Man; Liliental-Weber, Z.

    1991-11-01

    We have measured the excess As atoms present in gaze layers grown by molecular beam epitaxy at low substrate temperatures using particle induced x-ray emission technique. The amount of excess As atoms in layers grown by MBE at 200{degrees}C were found to be {approximately} 4 {times} 10{sup 20} cm{sup {minus}2}. Subsequent annealing of the layers under As overpressure at 600{degrees}C did not result in any substantial As loss. However, transmission electron microscopy revealed that As precipitates (2-5nm in diameter) were present in the annealed layers. The lattice location of the excess As atoms in the as grown layers was investigated by ion channeling methods. Angular scans were performed in the <110> axis of the crystal. Our results strongly suggest that a large fraction of these excess As atoms are located in an interstitial position close to an As row. These As ``intersitials`` are located at a site slightly displaced from the tetrahedral site in a diamond cubic lattice. No interstitial As signal is observed in the annealed layers.

  18. Performance and reproducibility enhancement of HgCdTe molecular beam epitaxy growth on CdZnTe substrates using interfacial HgTe/CdTe superlattice layers

    SciTech Connect

    Chang Yong; Zhao Jun; Abad, Hisham; Grein, Christoph H.; Sivananthan, Sivalingam; Aoki, Toshihiro; Smith, David J.

    2005-03-28

    Interfacial layers including HgTe/CdTe superlattices (SLs) were introduced during the molecular-beam epitaxy growth of HgCdTe on CdZnTe (211)B substrates. Transmission-electron-microscopic observations show that the SLs smooth out the substrates' surface roughness during growth, and can also bend or block threading dislocations in a way that prevents their propagation from the substrate into the functional HgCdTe epilayers. An average etch pit density value in the low-10{sup 5} cm{sup -2} range was reproducibly achieved in long wavelength HgCdTe samples, with the best value being 4x10{sup 4} cm{sup -2}. Photoconductive decay lifetime measurements give values approaching theoretical limits, as determined by the intrinsic radiative and Auger recombination mechanisms. The use of such interfacial layers thus leads to enhanced growth yields and material properties.

  19. High In-content InGaN layers synthesized by plasma-assisted molecular-beam epitaxy: Growth conditions, strain relaxation, and In incorporation kinetics

    NASA Astrophysics Data System (ADS)

    Valdueza-Felip, S.; Bellet-Amalric, E.; Núñez-Cascajero, A.; Wang, Y.; Chauvat, M.-P.; Ruterana, P.; Pouget, S.; Lorenz, K.; Alves, E.; Monroy, E.

    2014-12-01

    We report the interplay between In incorporation and strain relaxation kinetics in high-In-content InxGa1-xN (x = 0.3) layers grown by plasma-assisted molecular-beam epitaxy. For In mole fractions x = 0.13-0.48, best structural and morphological qualities are obtained under In excess conditions, at In accumulation limit, and at a growth temperature where InGaN decomposition is active. Under such conditions, in situ and ex situ analyses of the evolution of the crystalline structure with the layer thickness point to an onset of misfit relaxation after the growth of 40 nm, and a gradual relaxation during more than 200 nm, which results in an inhomogeneous strain distribution along the growth axis. This process is associated with a compositional pulling effect, i.e., indium incorporation is partially inhibited in presence of compressive strain, resulting in a compositional gradient with increasing In mole fraction towards the surface.

  20. Photoluminescence study of the substitution of Cd by Zn during the growth by atomic layer epitaxy of alternate CdSe and ZnSe monolayers

    SciTech Connect

    Hernández-Calderón, I.; Salcedo-Reyes, J. C.

    2014-05-15

    We present a study of the substitution of Cd atoms by Zn atoms during the growth of alternate ZnSe and CdSe compound monolayers (ML) by atomic layer epitaxy (ALE) as a function of substrate temperature. Samples contained two quantum wells (QWs), each one made of alternate CdSe and ZnSe monolayers with total thickness of 12 ML but different growth parameters. The QWs were studied by low temperature photoluminescence (PL) spectroscopy. We show that the Cd content of underlying CdSe layers is affected by the exposure of the quantum well film to the Zn flux during the growth of ZnSe monolayers. The amount of Cd of the quantum well film decreases with higher exposures to the Zn flux. A brief discussion about the difficulties to grow the Zn{sub 0.5}Cd{sub 0.5}Se ordered alloy (CuAu-I type) by ALE is presented.

  1. Band lineup of layered semiconductor heterointerfaces prepared by van der Waals epitaxy: Charge transfer correction term for the electron affinity rule

    NASA Astrophysics Data System (ADS)

    Schlaf, R.; Lang, O.; Pettenkofer, C.; Jaegermann, W.

    1999-03-01

    The occurrence of quantum dipoles at layered materials semiconductor heterointerfaces was investigated by photoemission spectroscopy (PES). Due to the unique properties of layered compounds the prepared interfaces are essentially free of the structural problems known from the usually investigated heterosystems composed of III-V, IV or II-VI materials allowing the detailed investigation of electronic phenomena at the interfaces. We investigated heterostructures composed of epitaxial layers of SnS2 and SnSe2 on different single crystalline layered chalcogenide substrates (WSe2, MoS2, MoTe2, and GaSe). The epilayers were grown by van der Waals epitaxy (vdWe) on the (0001) plane of the substrate crystals. For every system the valence band offset was determined by careful evaluation of the PES data as a function of the film thickness. Using published values for the band gaps and the experimentally determined work functions and surface potentials the band lineup for each system was determined. The band offsets of all systems were found to differ from the prediction of the electron affinity rule (EAR) by a small systematic deviation which was related to the occurrence of localized quantum dipoles at the interface. This deviation can be expressed as a linear charge transfer correction term added to the original EAR. This corrected EAR is still a linear rule allowing the assignment of "characteristic energies" to each material for the calculation of the band offset. We could demonstrate that the error margin of the corrected EAR lies well within the experimental error of PES experiments, thus proving the general applicability of linear laws for the determination of the band offset in absence of structural dipoles.

  2. Correlation between the residual stress and the density of threading dislocations in GaN layers grown by hydride vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Barchuk, M.; Röder, C.; Shashev, Y.; Lukin, G.; Motylenko, M.; Kortus, J.; Pätzold, O.; Rafaja, D.

    2014-01-01

    The correlation between the residual stress and the density of threading dislocations was investigated in polar GaN layers that were grown by using hydride vapor phase epitaxy (HVPE) on three different GaN templates. The first template type was GaN grown on sapphire by metal-organic vapor phase epitaxy. The second template type was a closed GaN nucleation layer grown on sapphire by HVPE. The third template type was a non-closed GaN nucleation layer grown by HVPE, which formed isolated pyramids on the sapphire surface. The residual stress was determined using the combination of micro-Raman spectroscopy and modified sin2 ψ method. The interplanar spacings needed for the sin2 ψ method were obtained from the reciprocal space maps that were measured using high-resolution X-ray diffraction. The density of threading dislocations was concluded from the broadening of the reciprocal lattice points that was measured using high-resolution X-ray diffraction as well. The fitting of the reciprocal space maps allowed the character of the threading dislocations to be described quantitatively in terms of the fractions of edge and screw dislocations. It was found that the threading dislocation density increases with increasing compressive residual stress. Furthermore, the dislocation density and the residual stress decrease with increasing thickness of the GaN layers. The edge component of the threading dislocations was dominant in all samples. Still, some differences in the character of the dislocations were observed for different templates.

  3. Dynamic atomic layer epitaxy of InN on/in +c-GaN matrix: Effect of "In+N" coverage and capping timing by GaN layer on effective InN thickness

    NASA Astrophysics Data System (ADS)

    Yoshikawa, Akihiko; Kusakabe, Kazuhide; Hashimoto, Naoki; Hwang, Eun-Sook; Itoi, Takaomi

    2016-01-01

    The growth front in the self-organizing and self-limiting epitaxy of ˜1 monolayer (ML)-thick InN wells on/in +c-GaN matrix by molecular beam epitaxy (MBE) has been studied in detail, with special attention given to the behavior and role of the N atoms. The growth temperatures of interest are above 600 °C, far higher than the typical upper critical temperature of 500 °C in MBE. It was confirmed that 2 ML-thick InN wells can be frozen/inserted in GaN matrix at 620 °C, but it was found that N atoms at the growth front tend to selectively re-evaporate more quickly than In atoms at temperatures higher than 650 °C. As a result, the effective thickness of inserted InN wells in the GaN matrix at 660-670 °C were basically 1 ML or sub-ML, even though they were capped by a GaN barrier at the time of 2 ML "In+N" coverage. Furthermore, it was found that the N atoms located below In atoms in the dynamic atomic layer epitaxy growth front had remarkably weaker bonding to the +c-GaN surface.

  4. Surface segregation as a means of gettering Cu in liquid-phase-epitaxy silicon thin layers grown from Al-Cu-Si solutions

    SciTech Connect

    Wang, T.H.; Ciszek, T.F.; Reedy, R.; Asher, S.; King, D.

    1996-05-01

    The authors demonstrate that, by using the natural surface segregation phenomenon, Cu can be gettered to the surface from the bulk of silicon layers so that its concentrations in the liquid-phase-epitaxy (LPE) layers are much lower than its solubility at the layer growth temperature and the reported 10{sup 17} cm{sup {minus}3} degradation threshold for solar-cell performance. Secondary-ion mass spectroscopy (SIMS) analysis indicates that, within a micron-deep sub-surface region, Cu accumulates even in as-grown LPE samples. Slower cooling after growth to room temperature enhances this Cu enrichment. X-ray photoelectron spectroscopy (XPS) measurement shows as much as 3.2% Cu in a surface region of about 50 {Angstrom}. More surface-sensitive, ion-scattering spectroscopy (ISS) analysis further reveals about 7% of Cu at the top surface. These results translate to an areal gettering capacity of about 1.0 x 10{sup 16} cm{sup {minus}2}, which is higher than the available total-area density of Cu in the layer and substrate (3.6 x 10{sup 15} cm{sup {minus}2} for a uniform 1.2 x 10{sup 17}cm{sup {minus}3} Cu throughout the layer and substrate with a total thickness of 300 {mu}m).

  5. Optical in-situ monitoring system for simultaneous measurement of thickness and curvature of thick layer stacks during hydride vapor phase epitaxy growth of GaN

    NASA Astrophysics Data System (ADS)

    Semmelroth, K.; Berwian, P.; Schröter, C.; Leibiger, G.; Schönleber, M.; Friedrich, J.

    2015-10-01

    For improved real-time process control we integrated a novel optical in-situ monitoring system in a vertical reactor for hydride vapor phase epitaxy (HVPE) growth of gallium nitride (GaN) bulk crystals. The in-situ monitoring system consists of a fiber-optical interferometric sensor in combination with an optimized differential measuring head. The system only needs one small optical path perpendicular to the center of the layer stack typically consisting of sapphire as substrate and GaN. It can handle sample distances up to 1 m without difficulty. The in-situ monitoring system is simultaneously measuring the optical layer thicknesses of the GaN/sapphire layer stack and the absolute change of the distance between the measuring head and the backside of the layer stack. From this data it is possible to calculate the thickness of the growing GaN up to a thickness of about 1000 μm and the absolute change in curvature of the layer stack. The performance of the in-situ monitoring system is shown and discussed based on the measured interference signals recorded during a short-time and a long-time HVPE growth run.

  6. Properties of YBCO on LaMnO3-capped IBAD MgO-templates without Homo-epitaxial MgO layer.

    SciTech Connect

    Aytug, Tolga; Paranthaman, Mariappan Parans; Kim, Kyunghoon; Zhang, Yifei; Cantoni, Claudia; Zuev, Yuri L; Goyal, Amit; Thompson, James R; Christen, David K

    2009-01-01

    Previously, it has been well established that in an IBAD architecture for coated conductors, (1) LaMnO3 (LMO) buffer layers are structurally and chemically compatible with an underlying homo-epitaxial MgO layer and (2) high current density YBCO films can be grown on these LMO templates. In the present work, the homo-epi MgO layer has been successfully eliminated and a LMO cap layer was grown directly on the IBAD (MgO) template. The performance of the LMO/IBAD (MgO) samples has been qualified by depositing 1 m-thick YBCO coatings by pulsed laser deposition. Electrical transport measurements of YBCO films on the standard (with homo-epi MgO) and simplified (without homo-epi MgO) IBAD architectures were carried out. The angular dependencies of critical current density (Jc) are similar for both IBAD architectures. XRD measurements indicate good, c-axis aligned YBCO films. Transmission electron microscopy (TEM) images reveal that microstructures of YBCO/LMO/IBAD (MgO) and YBCO/LMO/homo-epi MgO/IBAD (MgO) templates are similar. These results demonstrate the strong potential of using LMO as a single cap layer directly on IBAD (MgO) for the development of a simplified IBAD architecture.

  7. (Al,In)N layers and (Al,In)N/GaN heterostructures grown by plasma-assisted molecular beam epitaxy on 6H-SiC(0001)

    SciTech Connect

    Ive, Tommy; Brandt, Oliver; Kong Xiang; Trampert, Achim; Ploog, Klaus H.

    2008-07-15

    We study the properties of (Al,In)N layers and (Al,In)N/GaN heterostructures grown on 6H-SiC(0001) by plasma-assisted molecular beam epitaxy. The (Al,In)N films are deposited on a GaN buffer layer. A growth temperature of 500 deg. C and above results in low In contents which give rise to cracks due to the large tensile strain experienced from the underlying GaN buffer layer. In addition, these layers exhibit strong phase separation leading to inhomogeneous In composition and rough surfaces. In contrast, samples with homogeneous and well-controlled In-contents between 10%-30% are reproducibly obtained in the temperature range of 250-350 deg. C. Surprisingly, nominally lattice-matched layers with an In content of 17%-18% also exhibit cracks. Symmetric {omega}-2{theta} x-ray diffraction scans and reciprocal space maps reveal the presence of a strain gradient in these layers despite the apparently lattice-matched conditions. Transmission electron microscopy indicates that these cracks are the result of tensile stresses induced by crystallite coalescence and grain-boundary formation. This mechanism can be counteracted by augmenting the adatom mobility through increasing the growth temperature and the N flux. However, phase separation sets an upper limit on the growth temperature and a moderate increase to 350-400 deg. C is sufficient to obtain crack-free and homogeneous (Al,In)N layers. The results of our growth experiments lead to a phase diagram which shows the optimum growth window for (Al,In)N layers. By choosing the growth conditions within this window, we are able to obtain crack-free Al{sub 0.82}In{sub 0.18}N/GaN multilayers with abrupt interfaces.

  8. Investigation of electrical and optothermal properties of Si-doped GaSb epitaxial layers by the Hall effect, PL measurement and photothermal deflection spectroscopy

    NASA Astrophysics Data System (ADS)

    Abroug, S.; Saadallah, F.; Genty, F.; Yacoubi, N.

    2009-11-01

    The aim of this work is to investigate the influence of Si-doping on the optical, thermal and electrical properties of GaSb epitaxial layers. Such an influence was quantified through photoluminescence (PL), mirage effect (photothermal spectroscopy) and Hall effect measurements. Several GaSb samples, grown by Molecular Beam Epitaxy (MBE) on (100)-oriented GaAs semiinsulating substrates, with different Si-doping levels ranging from 4.95 × 1016at .cm-3 up to 8.11.1019 at .cm-3 were tested. As a comparison, the same measurements were also performed on a GaSb non intentionally doped layer. The Hall effect data shows a monotonic decrease in carrier mobility when the hole concentration increase. The effect of band-to-band, band-impurity transitions on the PL gap E0 and the influence of high impurity concentration on the PL and absorption spectra have been also studied. Finally, the optical absorption changes induced by Si-doping on GaSb samples were investigated by photothermal deflection. It was shown that this technique allows a very precise deduction of the real interband gap energy of a semiconductor material as GaSb. Thermal conductivities were also deduced from the photothermal deflection measurements. The found values are very low due to the thermal resistivity of the layer-substrate interface but also due to the lattice-mismatch between GaSb epilayers and the GaAs substrate. However, the contribution of the free carriers to the thermal conductivity, with a high p-doping level (p > 1019cm-3), could be highlighted.

  9. Atomic Layer Deposition of p-Type Epitaxial Thin Films of Undoped and N-Doped Anatase TiO2.

    PubMed

    Vasu, K; Sreedhara, M B; Ghatak, J; Rao, C N R

    2016-03-01

    Employing atomic layer deposition, we have grown p-type epitaxial undoped and N-doped anatase TiO2(001) thin films on c-axis Al2O3 substrate. From X-ray diffraction and transmission electron microscopy studies, crystallographic relationships between the film and the substrate are found to be (001)TiO2//(0001)Al2O3 and [1̅10]TiO2//[011̅0]Al2O3. N-doping in TiO2 thin films enhances the hole concentration and mobility. The optical band gap of anatase TiO2 (3.23 eV) decreases to 3.07 eV upon N-doping. The epitaxial films exhibit room-temperature ferromagnetism and photoresponse. A TiO2-based homojunction diode was fabricated with rectification from the p-n junction formed between N-doped p-TiO2 and n-TiO2. PMID:26963716

  10. Towards defect-free epitaxial CdTe and MgCdTe layers grown on InSb (001) substrates

    NASA Astrophysics Data System (ADS)

    Lu, Jing; DiNezza, Michael J.; Zhao, Xin-Hao; Liu, Shi; Zhang, Yong-Hang; Kovacs, Andras; Dunin-Borkowski, Rafal E.; Smith, David J.

    2016-04-01

    A series of three CdTe/MgxCd1-xTe (x~0.24) double heterostructures grown by molecular beam epitaxy on InSb (001) substrates at temperatures in the range of 235-295 °C have been studied using conventional and advanced electron microscopy techniques. Defect analysis based on bright-field electron micrographs indicates that the structure grown at 265 °C has the best structural quality of the series, while structures grown at 30 °C lower or higher temperature show highly defective morphology. Geometric phase analysis of the CdTe/InSb interface for the sample grown at 265 °C reveals minimal interfacial elastic strain, and there is no visible evidence of interfacial defect formation in aberration-corrected electron micrographs of this particular sample. Such high quality CdTe epitaxial layers should provide the basis for applications such as photo-detectors and multi-junction solar cells.

  11. Liquid phase epitaxy of binary III–V nanocrystals in thin Si layers triggered by ion implantation and flash lamp annealing

    SciTech Connect

    Wutzler, Rene Rebohle, Lars; Prucnal, Slawomir; Bregolin, Felipe L.; Hübner, Rene; Voelskow, Matthias; Helm, Manfred; Skorupa, Wolfgang

    2015-05-07

    The integration of III–V compound semiconductors in Si is a crucial step towards faster and smaller devices in future technologies. In this work, we investigate the formation process of III–V compound semiconductor nanocrystals, namely, GaAs, GaSb, and InP, by ion implantation and sub-second flash lamp annealing in a SiO{sub 2}/Si/SiO{sub 2} layer stack on Si grown by plasma-enhanced chemical vapor deposition. Raman spectroscopy, Rutherford Backscattering spectrometry, and transmission electron microscopy were performed to identify the structural and optical properties of these structures. Raman spectra of the nanocomposites show typical phonon modes of the compound semiconductors. The formation process of the III–V compounds is found to be based on liquid phase epitaxy, and the model is extended to the case of an amorphous matrix without an epitaxial template from a Si substrate. It is shown that the particular segregation and diffusion coefficients of the implanted group-III and group-V ions in molten Si significantly determine the final appearance of the nanostructure and thus their suitability for potential applications.

  12. Magnetic and dielectric properties of layered perovskite Gd2Ti2O7 thin film epitaxially stabilized on a perovskite single crystal

    NASA Astrophysics Data System (ADS)

    Ukita, Takashi; Hirose, Yasushi; Ohno, Sawako; Hatabayashi, Kunitada; Fukumura, Tomoteru; Hasegawa, Tetsuya

    2012-04-01

    Layered perovskite (LP) titanates, Ln2Ti2O7 (Ln = lanthanoids), are ferroelectric materials containing magnetic Ln3+ ions at A-site. Metastable LP-Gd2Ti2O7 was fabricated in epitaxial thin film form on lattice-matched perovskite substrates and its dielectric and magnetic properties were investigated. The (100)-oriented LP-Gd2Ti2O7 films were epitaxially grown on (110) plane of (LaAlO3)0.3-(SrAl0.5Ta0.5O3)0.7 (LSAT) and Nb-doped SrTiO3 by using a pulsed laser deposition method. Piezoresponse force microscope measurements revealed that LP-Gd2Ti2O7 has spontaneous polarization along the b-axis at room temperature, strongly suggesting room temperature ferroelectricity. Magnetization measurements showed paramagnetic behavior with weak antiferromagnetic interaction around 2 K. Small positive magneto-dielectric effect (Δɛ/ɛ ˜ 10-5 order) was also confirmed at 10 K.

  13. Atomic layer epitaxy of Ruddlesden-Popper SrO(SrTiO{sub 3}){sub n} films by means of metalorganic aerosol deposition

    SciTech Connect

    Jungbauer, M.; Hühn, S.; Moshnyaga, V.; Egoavil, R.; Tan, H.; Verbeeck, J.; Van Tendeloo, G.

    2014-12-22

    We report an atomic layer epitaxial growth of Ruddlesden-Popper (RP) thin films of SrO(SrTiO{sub 3}){sub n} (n = ∞, 2, 3, 4) by means of metalorganic aerosol deposition (MAD). The films are grown on SrTiO{sub 3}(001) substrates by means of a sequential deposition of Sr-O/Ti-O{sub 2} atomic monolayers, monitored in-situ by optical ellipsometry. X-ray diffraction and transmission electron microscopy (TEM) reveal the RP structure with n = 2–4 in accordance with the growth recipe. RP defects, observed by TEM in a good correlation with the in-situ ellipsometry, mainly result from the excess of SrO. Being maximal at the film/substrate interface, the SrO excess rapidly decreases and saturates after 5–6 repetitions of the SrO(SrTiO{sub 3}){sub 4} block at the level of 2.4%. This identifies the SrTiO{sub 3} substrate surface as a source of RP defects under oxidizing conditions within MAD. Advantages and limitations of MAD as a solution-based and vacuum-free chemical deposition route were discussed in comparison with molecular beam epitaxy.

  14. Liquid phase epitaxy of binary III-V nanocrystals in thin Si layers triggered by ion implantation and flash lamp annealing

    NASA Astrophysics Data System (ADS)

    Wutzler, Rene; Rebohle, Lars; Prucnal, Slawomir; Bregolin, Felipe L.; Hübner, Rene; Voelskow, Matthias; Helm, Manfred; Skorupa, Wolfgang

    2015-05-01

    The integration of III-V compound semiconductors in Si is a crucial step towards faster and smaller devices in future technologies. In this work, we investigate the formation process of III-V compound semiconductor nanocrystals, namely, GaAs, GaSb, and InP, by ion implantation and sub-second flash lamp annealing in a SiO2/Si/SiO2 layer stack on Si grown by plasma-enhanced chemical vapor deposition. Raman spectroscopy, Rutherford Backscattering spectrometry, and transmission electron microscopy were performed to identify the structural and optical properties of these structures. Raman spectra of the nanocomposites show typical phonon modes of the compound semiconductors. The formation process of the III-V compounds is found to be based on liquid phase epitaxy, and the model is extended to the case of an amorphous matrix without an epitaxial template from a Si substrate. It is shown that the particular segregation and diffusion coefficients of the implanted group-III and group-V ions in molten Si significantly determine the final appearance of the nanostructure and thus their suitability for potential applications.

  15. Integration and structural analysis of strain relaxed bi-epitaxial zinc oxide(0001) thin film with silicon(100) using titanium nitride buffer layer

    SciTech Connect

    Gupta, Pranav; Narayan, Jagdish

    2014-01-28

    Epitaxial growth of c-plane ZnO(0001) has been demonstrated on the Si(001) by using TiN as an intermediate buffer layer. Because of different out of plane symmetry of the substrate (Si/TiN) and the film (ZnO), two orientations of ZnO domains were obtained and the ZnO film growth is of bi-epitaxial nature. The ZnO thin film was observed to be nearly strain relaxed from X-ray and Raman measurements. The interface between the ZnO and TiN was investigated by transmission electron microscopy, and atomic arrangement has been modeled to understand the crystallographic orientation and structure of the domain/grain boundaries. Reaction at ZnO/TiN interface at higher growth temperature causing zinc titanate formation was observed. The grain boundary structure between the observed domains investigated by scanning transmission electron microscopy, revealed the ZnO(0001) planes to be contiguous across the grain boundary which is significant from the perspective of conduction electron scattering. In this configuration, the TiN (being electrically conductive) can be effectively used as an electrode for novel vertically integrated device applications (like light emitting diodes) directly on Si(100) substrate.

  16. Studies of deep level centers determining the diffusion length in epitaxial layers and crystals of undoped n-GaN

    NASA Astrophysics Data System (ADS)

    Lee, In-Hwan; Polyakov, A. Y.; Smirnov, N. B.; Yakimov, E. B.; Tarelkin, S. A.; Turutin, A. V.; Shemerov, I. V.; Pearton, S. J.

    2016-05-01

    A wide variety of parameters were measured for undoped n-GaN grown by hydride vapor phase epitaxy and compared to n-GaN films grown by conventional and lateral overgrowth metalorganic chemical vapor deposition. The parameters included deep level electron and hole trap spectra, microcathodoluminescence, electron beam induced current, diffusion length, and electron capture cross section from the dependence of the low temperature persistent photocapacitance on forward bias injection pulse duration. The results show a prominent role of electron traps with levels near Ec-0.56 eV in limiting the lifetime and diffusion length values in all these materials.

  17. Control of hydrogen and carbon impurity inclusion during the growth of GaAsN thin film by atomic layer epitaxy

    NASA Astrophysics Data System (ADS)

    Yokoyama, Yuki; Fukuyama, Atsuhiko; Haraguchi, Tomohiro; Yamauchi, Toshihiro; Ikari, Tetsuo; Suzuki, Hidetoshi

    2016-01-01

    The effects of growth temperature and nitrogen (N) source duration on N, carbon (C), and hydrogen (H) concentrations in GaAsN layers grown by atomic layer epitaxy (ALE) were investigated to understand the incorporation mechanisms of these atoms. In addition, the effects of the above growth conditions on the self-limiting mechanism (SLM) were investigated. The SLM was in effect at growth temperatures of 500 and 520 °C. The origin of the residual C was not N but other sources. With increasing N source duration, the N and H concentrations increased and saturated. The N incorporation mechanisms were discussed by a simple model considering the absorption and desorption of N atoms on the gallium (Ga)-covered surface. H atoms originating from the N source were incorporated in to the GaAsN layer. According to the ratio of the H concentration to the N concentration, the difference in the incorporation processes of N and H atoms in ALE-grown GaAsN layers was discussed.

  18. Direct observation of strain in InAs quantum dots and cap layer during molecular beam epitaxial growth using in situ X-ray diffraction

    SciTech Connect

    Shimomura, Kenichi; Ohshita, Yoshio; Kamiya, Itaru; Suzuki, Hidetoshi; Sasaki, Takuo; Takahasi, Masamitu

    2015-11-14

    Direct measurements on the growth of InAs quantum dots (QDs) and various cap layers during molecular beam epitaxy are performed by in situ X-ray diffraction (XRD). The evolution of strain induced both in the QDs and cap layers during capping is discussed based on the XRD intensity transients obtained at various lattice constants. Transients with different features are observed from those obtained during InGaAs and GaAs capping. The difference observed is attributed to In-Ga intermixing between the QDs and the cap layer under limited supply of In. Photoluminescence (PL) wavelength can be tuned by controlling the intermixing, which affects both the strain induced in the QDs and the barrier heights. The PL wavelength also varies with the cap layer thickness. A large redshift occurs by reducing the cap thickness. The in situ XRD observation reveals that this is a result of reduced strain. We demonstrate how such information about strain can be applied for designing and preparing novel device structures.

  19. Epitaxial ZnO/LiNbO{sub 3}/ZnO stacked layer waveguide for application to thin-film Pockels sensors

    SciTech Connect

    Akazawa, Housei Fukuda, Hiroshi

    2015-05-15

    We produced slab waveguides consisting of a LiNbO{sub 3} (LN) core layer that was sandwiched with Al-doped ZnO cladding layers. The ZnO/LN/ZnO stacked layers were grown on sapphire C-planes by electron cyclotron resonance (ECR) plasma sputtering and were subjected to structural, electrical, and optical characterizations. X-ray diffraction confirmed that the ZnO and LN layers were epitaxial without containing misoriented crystallites. The presence of 60°-rotational variants of ZnO and LN crystalline domains were identified from X-ray pole figures. Cross-sectional transmission electron microscopy images revealed a c-axis orientated columnar texture for LN crystals, which ensured operation as electro-optic sensors based on optical anisotropy along longitudinal and transversal directions. The interfacial roughness between the LN core and ZnO bottom layers as well as that between the ZnO top and the LN core layers was less than 20 nm, which agreed with surface images observed with atomic force microscopy. Outgrowth of triangular LN crystalline domains produced large roughness at the LN film surface. The RMS roughness of the LN film surface was twice that of the same structure grown on sapphire A-planes. Vertical optical transmittance of the stacked films was higher than 85% within the visible and infrared wavelength range. Following the approach adopted by Teng and Man [Appl. Phys. Lett. 56, 1734 (1990)], ac Pockels coefficients of r{sub 33} = 24-28 pm/V were derived for c-axis oriented LN films grown on low-resistive Si substrates. Light propagation within a ZnO/LN/ZnO slab waveguide as well as within a ZnO single layer waveguide was confirmed. The birefringence of these waveguides was 0.11 for the former and 0.05 for the latter.

  20. Epitaxial thin films

    DOEpatents

    Hunt, Andrew Tye; Deshpande, Girish; Lin, Wen-Yi; Jan, Tzyy-Jiuan

    2006-04-25

    Epitatial thin films for use as buffer layers for high temperature superconductors, electrolytes in solid oxide fuel cells (SOFC), gas separation membranes or dielectric material in electronic devices, are disclosed. By using CCVD, CACVD or any other suitable deposition process, epitaxial films having pore-free, ideal grain boundaries, and dense structure can be formed. Several different types of materials are disclosed for use as buffer layers in high temperature superconductors. In addition, the use of epitaxial thin films for electrolytes and electrode formation in SOFCs results in densification for pore-free and ideal gain boundary/interface microstructure. Gas separation membranes for the production of oxygen and hydrogen are also disclosed. These semipermeable membranes are formed by high-quality, dense, gas-tight, pinhole free sub-micro scale layers of mixed-conducting oxides on porous ceramic substrates. Epitaxial thin films as dielectric material in capacitors are also taught herein. Capacitors are utilized according to their capacitance values which are dependent on their physical structure and dielectric permittivity. The epitaxial thin films of the current invention form low-loss dielectric layers with extremely high permittivity. This high permittivity allows for the formation of capacitors that can have their capacitance adjusted by applying a DC bias between their electrodes.

  1. Growth, structural, and magnetic characterization of epitaxial Co2MnSi films deposited on MgO and Cr seed layers

    NASA Astrophysics Data System (ADS)

    Ortiz, G.; García-García, A.; Biziere, N.; Boust, F.; Bobo, J. F.; Snoeck, E.

    2013-01-01

    We report detailed structural characterization and magneto-optical Kerr magnetometry measurements at room temperature in epitaxial Co2MnSi thin films grown on MgO(001) and Cr(001) buffered MgO single crystals prepared by sputtering. While Co2MnSi/Cr//MgO(001) films display the expected cubic anisotropy, the magnetization curves obtained for Co2MnSi//MgO(001) samples exhibit a superimposed in-plane uniaxial magnetic anisotropy. The evolution of magnetization with film thickness points to a relevant interfacial Co2MnSi-buffer layer (Cr or MgO) contribution which competes with magnetic properties of bulk Co2MnSi, resulting in a drastic change in the magnetism of the whole sample. The origin of this interfacial magnetic anisotropy is discussed and correlated with our structural studies.

  2. Domain epitaxy in TiO2/ -Al2O3 thin film heterostructures with Ti2O3 transient layer

    SciTech Connect

    Bayati, M R; Molaei, R; Narayan, Jagdish; Zhou, Honghui; Pennycook, Stephen J

    2012-01-01

    Rutile TiO2 films were grown epitaxially on -alumina (sapphire(0001)) substrates and characterized by x-ray diffraction and scanning transmission electron microscopy. It was revealed that the rutile film initially grows pseudomorphically on sapphire as Ti2O3 and, after a few monolayers, it grows tetragonally on the Ti2O3/sapphire platform. Formation of the Ti2O3 transient layer was attributed to the symmetry mismatch between tetragonal structure of TiO2 and hexagonal structure of alumina. The separation between the [10](101) misfit dislocations was dictated by Ti2O3 and was determined to be 9.7 which is consistent with 4/3 and 3/2 alternating domains across the film/substrate interface.

  3. Non-destructive observation of in-grown stacking faults in 4H-SiC epitaxial layer using mirror electron microscope

    SciTech Connect

    Hasegawa, Masaki; Ohno, Toshiyuki

    2011-10-01

    Mirror electron microscope (MEM) observation has been conducted for a 4-{mu}m-thick n-doped 4H-SiC epitaxial layer. If the sample is simultaneously illuminated with ultraviolet (UV) light of a slightly greater energy than the bandgap energy of 4H-SiC, in-grown stacking faults (IGSFs) can be clearly observed in MEM images. These observations were performed non-destructively, as almost all irradiated electrons returned without impinging the sample surface due to the negative voltage applied to the sample. High spatial resolution observation via MEM showed that multiple IGSFs were stacked up. The phenomenon in which the contrast of the IGSFs vanished in the absence of UV illumination and under UV illumination with a lower energy than the bandgap energy revealed that the origin of the contrast was the negative charging of IGSFs trapping electrons excited by UV light.

  4. Properties of Cu(thd)2 as a precursor to prepare Cu/SiO2 catalyst using the atomic layer epitaxy technique.

    PubMed

    Chen, Ching S; Lin, Jarrn H; You, Jainn H; Chen, Chi R

    2006-12-20

    The new Cu/SiO2 catalyst is developed by the atomic layer epitaxy (ALE) method. The ALE-Cu/SiO2 catalyst with high dispersion and nanoscale Cu particles appears to have very different catalytic properties from those of the typical Cu-based catalysts, which have satisfactory thermal stability to resist the sintering of Cu particles at 773 K. Due to the formation of small Cu particles, the ALE-Cu/SiO2 can strongly bind CO and give high catalytic activity for CO2 converted to CO in the reverse water-gas-shift reaction. The catalytic activity decreases in the order of 2.4% ALE-Cu/SiO2 =... 2% Pt/SiO2 > 2% Pd/SiO2 > 10.3% IM-Cu/SiO2. PMID:17165704

  5. Local Strain, Defects and Crystallographic Tilt in GaN(0001) Layers Grown by Maskless Pendeo-epitaxy from X-ray Microdiffraction

    SciTech Connect

    Barabash, R.I.; Ice, G.E.; Liu, W.; Einfeldt, S.; Roskovski, A.M.; Davis, R.F.

    2010-07-13

    Polychromatic x-ray microdiffraction, high-resolution monochromatic x-ray diffraction, and finite element simulations have been used to determine the distribution of strain, defects, and crystallographic tilt in uncoalesced GaN layers grown by maskless pendeo-epitaxy. An important materials parameter was the width-to-height ratio of the etched columns of GaN from which occurred the lateral growth of the wings. Tilt boundaries formed at the column/wing interface for samples with a large ratio. Formation of the tilt boundary can be avoided by using smaller ratios. The strain and tilt across the stripe increased with the width-to-height ratio. The wings were tilted upward at room temperature.

  6. Mechanism for persistent hexagonal island formation in AlN buffer layer during growth on Si (111) by plasma-assisted molecular beam epitaxy

    SciTech Connect

    Hsu, K.-Y.; Chung, H.-C.; Liu, C.-P.; Tu, L.-W.

    2007-05-21

    The characteristics of structure and morphology of AlN grown by a growth interruption method on Si (111) with plasma-assisted molecular beam epitaxy are investigated. It is found that the growth interruption method would improve the surface flatness of the AlN layer without the formation of Al droplets. However, AlN hexagonal islands were present and persistent throughout the entire growth owing to effective strain relaxation and Eherlich-Schowebel barrier effect of preexistent surface islands grown on higher terraces of the Si substrate. The density of threading dislocations underneath the hexagonal islands is much less than elsewhere in the film, which is presumably due to dislocation annihilation during the island growth process.

  7. Assessing the influence of the vertical epitaxial layer design on the lateral beam quality of high-power broad area diode lasers

    NASA Astrophysics Data System (ADS)

    Winterfeldt, M.; Rieprich, J.; Knigge, S.; Maaßdorf, A.; Hempel, M.; Kernke, R.; Tomm, J. W.; Erbert, G.; Crump, P.

    2016-03-01

    GaAs-based high-power broad-area diode lasers deliver optical output powers Popt > 10W with efficiency > 60%. However, their application is limited due to poor in-plane beam parameter product BPPlat=0.25×Θ95%×w95% (Θ95% and w95% are emission angle and aperture, 95% power content). We present experimental investigations on λ = 9xx nm broad area lasers that aim to identify regulating factors of the BPPlat connected to the epitaxial layer design. First, we assess the thermal lens of vertical designs with varying asymmetry, using thermal camera images to determine its strength. Under study are an extreme-double-asymmetric (EDAS) vertical structure and a reference (i.e. more symmetric) design. The lateral thermal profiles clearly show that BPPlat increase is correlated to the bowing of the thermal lens. The latter is derived out of a quadratic temperature fit in the active region beneath the current injection of the laser device and depends on the details of the epitaxial layers. Second, we test the benefit of low modal gain factor Γg0, predicted to improve BPPlat via a suppression of filamentation. EDAS-based lasers with single quantum well (SQW) and double quantum well (DQW) active regions were compared, with 2.5x reduced Γg0, for 2.2x reduced filament gain. However, no difference is seen in measured BPPlat, giving evidence that filamentary processes are no longer a limit. In contrast, devices with lower Γg0 demonstrate an up to twofold reduced near field modulation depth, potentially enabling higher facet loads and increased device facet reliability, when operated near to the COD limit.

  8. Low temperature p-type doping of (Al)GaN layers using ammonia molecular beam epitaxy for InGaN laser diodes

    SciTech Connect

    Malinverni, M. Lamy, J.-M.; Martin, D.; Grandjean, N.; Feltin, E.; Dorsaz, J.; Castiglia, A.; Rossetti, M.; Duelk, M.; Vélez, C.

    2014-12-15

    We demonstrate state-of-the-art p-type (Al)GaN layers deposited at low temperature (740 °C) by ammonia molecular beam epitaxy (NH{sub 3}-MBE) to be used as top cladding of laser diodes (LDs) with the aim of further reducing the thermal budget on the InGaN quantum well active region. Typical p-type GaN resistivities and contact resistances are 0.4 Ω cm and 5 × 10{sup −4} Ω cm{sup 2}, respectively. As a test bed, we fabricated a hybrid laser structure emitting at 400 nm combining n-type AlGaN cladding and InGaN active region grown by metal-organic vapor phase epitaxy, with the p-doped waveguide and cladding layers grown by NH{sub 3}-MBE. Single-mode ridge-waveguide LD exhibits a threshold voltage as low as 4.3 V for an 800 × 2 μm{sup 2} ridge dimension and a threshold current density of ∼5 kA cm{sup −2} in continuous wave operation. The series resistance of the device is 6 Ω and the resistivity is 1.5 Ω cm, confirming thereby the excellent electrical properties of p-type Al{sub 0.06}Ga{sub 0.94}N:Mg despite the low growth temperature.

  9. Strain states of AlN/GaN-stress mitigating layer and their effect on GaN buffer layer grown by ammonia molecular beam epitaxy on 100-mm Si(111)

    SciTech Connect

    Ravikiran, L.; Radhakrishnan, K.; Agrawal, M.; Dharmarasu, N.; Munawar Basha, S.

    2013-09-28

    The effect of strain states of AlN/GaN-stress mitigating layer (SML) on buried crack density and its subsequent influence on the residual stresses in GaN buffer layers grown using ammonia-molecular beam epitaxy on 100-mm Si(111) substrate has been investigated. Different stages involved in the formation of buried cracks, which are crack initialization, growth of relaxed AlN layer, and subsequent lateral over growth, are identified using in-situ curvature measurements. While the increase of GaN thickness in AlN/GaN-SML enhanced its compressive strain relaxation and resulted in reduced buried crack spacing, the variation of AlN thickness did not show any effect on the crack spacing. Moreover, the decrease in the crack spacing (or increase in the buried crack density) was found to reduce the residual compression in 1st and 2nd GaN layers of AlN/GaN-SML structure. The higher buried crack density relaxed the compressive strain in 1st GaN layer, which further reduced its ability to compensate the tensile stress generated during substrate cool down, and hence resulted in lower residual compressive stress in 2nd GaN layer.

  10. Volume production of high quality SiC substrates and epitaxial layers: Defect trends and device applications

    NASA Astrophysics Data System (ADS)

    Müller, St. G.; Sanchez, E. K.; Hansen, D. M.; Drachev, R. D.; Chung, G.; Thomas, B.; Zhang, J.; Loboda, M. J.; Dudley, M.; Wang, H.; Wu, F.; Byrappa, S.; Raghothamachar, B.; Choi, G.

    2012-08-01

    We review the progress of silicon carbide (SiC) bulk growth by the sublimation method, highlighting recent advances at Dow Corning, which resulted in the commercial release of 100 mm n-type 4H-SiC wafers with median micropipe densities (MPD) in production wafers <0.1 cm-2 and the demonstration of micropipe free material over a full 100 mm diameter. Investigations by Synchrotron White Beam X-ray Topography (SWBXRT) and molten KOH etch pit analysis of 100 mm wafers demonstrate threading screw dislocation densities <500 cm-2. Additional results indicate the positive impact of maintaining thermo-mechanical stress levels in the growing crystal below the critical resolved shear stress on reducing basal plane dislocation densities to values as low as ˜300-400 cm-2 in 100 mm crystals. We summarize the steps of systematic quality improvements on increasing wafer diameter, utilizing numerical simulations of the SiC growth system as a critical tool to guide this process. For the economical production of SiC epitaxy, a 10×100 mm wafer platform has been established in a warm-wall planetary chemical vapor deposition (CVD) reactor. The combined improvements in the epitaxy process, pre-epi wafer surface preparation and the underlying substrate quality itself have led to a reduction of the device killer defect density from 8 cm-2 to 1.5 cm-2 on a volume product like 100 mm 4° off-axis 6.5 μm epi-wafers. Dow Corning production epi-wafers routinely show Schottky diode yields above 90% at a die size of 2 mm×2 mm. Additionally, 50-100 μm thick epitaxy on 76 mm 4° off-axis wafers with morphological defect densities of 2-6 cm-2, a surface roughness (RMS) ≤1 nm as measured by atomic force microscopy (AFM), and carrier lifetimes consistently in the range of 2-3 μs has been demonstrated.

  11. Growth of epitaxial Y 2O 3 buffer layers on biaxially textured Ni-W substrates for YBCO coated conductors by MOD approach

    NASA Astrophysics Data System (ADS)

    Bhuiyan, M. S.; Paranthaman, M.; Kang, S.; Lee, D. F.; Salama, K.

    2005-06-01

    We have grown epitaxial Y 2O 3 buffer layers on biaxially textured Ni-W substrates for YBCO coated conductors using a newly developed metal organic decomposition (MOD) approach. Y 2O 3 precursor solution of 0.25 M concentration was spin coated on short samples of Ni-3 at.%W (Ni-W) substrates and heat-treated at 1150 °C in a gas mixture of Ar-4% H 2 for an hour. Detailed X-ray studies indicate that Y 2O 3 films have good out-of-plane and in-plane textures with full-width-half-maximum values of 6.22° and 7.51°, respectively. SEM and AFM investigations of Y 2O 3 films reveal a fairly dense and smooth microstructure without cracks and porosity. Highly textured YSZ barrier layers and CeO 2 cap layers were deposited on MOD Y 2O 3-buffered Ni-W substrates using rf-magnetron sputtering. Pulsed laser deposition was used to grow YBCO films on these substrates. A critical current, Jc, of about 1.21 MA/cm 2 at 77 K and self-field was obtained on YBCO (PLD)/CeO 2 (sputtered)/YSZ (sputtered)/Y 2O 3 (spin-coated)/Ni-W.

  12. MOD approach for the growth of epitaxial CeO2 buffer layers on biaxially textured Ni W substrates for YBCO coated conductors

    NASA Astrophysics Data System (ADS)

    Bhuiyan, M. S.; Paranthaman, M.; Sathyamurthy, S.; Aytug, T.; Kang, S.; Lee, D. F.; Goyal, A.; Payzant, E. A.; Salama, K.

    2003-11-01

    We have grown epitaxial CeO2 buffer layers on biaxially textured Ni-W substrates for YBCO coated conductors using a newly developed metal organic decomposition (MOD) approach. Precursor solution of 0.25 M concentration was spin coated on short samples of Ni-3 at%W (Ni-W) substrates and heat-treated at 1100 °C in a gas mixture of Ar-4%H2 for 15 min. Detailed x-ray studies indicate that CeO2 films have good out-of-plane and in-plane textures with full-width-half-maximum values of 5.8° and 7.5°, respectively. High temperature in situ XRD studies show that the nucleation of CeO2 films starts at 600 °C and the growth completes within 5 min when heated at 1100 °C. SEM and AFM investigations of CeO2 films reveal a fairly dense microstructure without cracks and porosity. Highly textured YSZ barrier layers and CeO2 cap layers were deposited on MOD CeO2-buffered Ni-W substrates using rf-magnetron sputtering. Pulsed laser deposition (PLD) was used to grow YBCO films on these substrates. A critical current, Jc, of about 1.5 MA cm-2 at 77 K and self-field was obtained on YBCO (PLD)/CeO2 (sputtered)/YSZ (sputtered)/CeO2 (spin-coated)/Ni-W.

  13. Comparison study of photoluminescence from InGaN/GaN multiple quantum wells and InGaN epitaxial layers under large hydrostatic pressure

    SciTech Connect

    Shan, W.; Perlin, P.; Ager, J.W. III; Walukiewicz, W.; Haller, E.E.; McCluskey, M.D.; Johnson, N.M.; Bour, D.P.

    1998-09-01

    We report the results of a comparison study of photoluminescence (PL) from an In{sub 0.15}Ga{sub 0.85}N/GaN multiple-quantum-well (MQW) sample and an In{sub 0.11}Ga{sub 0.89}N thick epitaxial-layer sample, which have very similar band-gap energies. Large hydrostatic pressures were used for our investigations. The PL emissions in both samples were found to shift linearly to higher energy with applied pressure. In the MQW sample, the pressure response of the InGaN is dominated by the GaN layers, which leads to a significantly weaker pressure dependence as compared to the epilayer sample. Our results yield a pressure coefficient of 2.8{times}10{sup {minus}3}thinspeV/kbar for the In{sub 0.15}Ga{sub 0.85}N/GaN MQW sample and 4.0{times}10{sup {minus}3}thinspeV/kbar for the In{sub 0.11}Ga{sub 0.89}N epilayer. An abrupt decrease of PL intensity in both samples was observed at pressures above 100 kbar, indicating the carriers involved in the radiative recombination processes in the samples originate primarily from the adjacent GaN layers. {copyright} {ital 1998 American Institute of Physics.}

  14. Atomic layer epitaxy Group IV materials: Surface processes, thin films, devices and their characterization. Annual report, 1 January 1992-31 December 1992

    SciTech Connect

    Davis, R.F.; Bedair, S.; El-Masry, N.; Glass, J.T.

    1992-12-01

    An integrated growth and surface characterization system containing a hot filament reactor, sample transfer station, ESD and XPS has been established to investigate the ALE of diamond films. Complementary experiments concerned with the nucleation of diamond on molten surfaces, e. g., Al and Ge have also been conducted. Formation of GeO2 or an aluminum carbide and the degradation of the diamond by the molten material inhibited nucleation on the melted area. Monocrystalline thin films of Beta-SiC have been achieved in the temperature range of 850 deg -980 deg C by atomic layer-by-layer deposition of Si and C species via sequential exposures of Si(100) substrates to Si2H6 and C2H4. A UHV analytical system containing TPD, AES and XPS is being constructed in concert with the SiC ALE studies to determine the reaction chemistry important to this process. An eximer laser ablation system for the ALE of CeO2 has been completed and employed to successfully deposit films of this material on Si(100).... Atomic layer epitaxy(ALE), Diamond, Silicon carbide, Cerium dioxide.

  15. Effect of AlN buffer layer properties on the morphology and polarity of GaN nanowires grown by molecular beam epitaxy

    SciTech Connect

    Brubaker, Matt D.; Rourke, Devin M.; Sanford, Norman A.; Bertness, Kris A.; Bright, Victor M.

    2011-09-01

    Low-temperature AlN buffer layers grown via plasma-assisted molecular beam epitaxy on Si (111) were found to significantly affect the subsequent growth morphology of GaN nanowires. The AlN buffer layers exhibited nanowire-like columnar protrusions, with their size, shape, and tilt determined by the AlN V/III flux ratio. GaN nanowires were frequently observed to adopt the structural characteristics of the underlying AlN columns, including the size and the degree of tilt. Piezoresponse force microscopy and polarity-sensitive etching indicate that the AlN films and the protruding columns have a mixed crystallographic polarity. Convergent beam electron diffraction indicates that GaN nanowires are Ga-polar, suggesting that Al-polar columns are nanowire nucleation sites for Ga-polar nanowires. GaN nanowires of low density could be grown on AlN buffers that were predominantly N-polar with isolated Al-polar columns, indicating a high growth rate for Ga-polar nanowires and suppressed growth of N-polar nanowires under typical growth conditions. AlN buffer layers grown under slightly N-rich conditions (V/III flux ratio = 1.0 to 1.3) were found to provide a favorable growth surface for low-density, coalescence-free nanowires.

  16. Coalescence-induced planar defects in GaN layers grown on ordered arrays of nanorods by metal-organic vapour phase epitaxy

    NASA Astrophysics Data System (ADS)

    Huang, Chang-Ning; Shields, Philip A.; Allsopp, Duncan W. E.; Trampert, Achim

    2013-08-01

    The planar defect structure of coalesced GaN layers fabricated on ordered arrays of nanorods and grown by metal-organic vapour phase epitaxy has been studied using conventional and high-resolution transmission electron microscopy. During the process of coalescence, a boundary was created between two pyramids, where I1-type basal plane stacking faults propagating through the overgrown layers are terminated by Frank-Shockley partial dislocations. According to multislice HRTEM simulations of experimental observed images in the [ ? ] zone axis, the step-and hairpin-shaped basal prismatic stacking faults with inclined ? plane are consistent with Drum's structural model, which has a lower formation energy compared with the model proposed by Amelinckx. Based on the observation that there are no stacking faults in the overgrown layers prior to the nanopyramid merging, the mechanism of coalescence induced stacking faults is proposed. This research contributes to the understanding of planar defect formation in III-nitride semiconductor grown by a coalescence process.

  17. Effect of the growth temperature and the AlN mole fraction on In incorporation and properties of quaternary III-nitride layers grown by molecular beam epitaxy

    SciTech Connect

    Fernandez-Garrido, S.; Pereiro, J.; Munoz, E.; Calleja, E.; Gago, R.; Bertram, F.; Christen, J.; Luna, E.; Trampert, A.

    2008-10-15

    Indium incorporation into wurtzite (0001)-oriented In{sub x}Al{sub y}Ga{sub 1-x-y}N layers grown by plasma-assisted molecular beam epitaxy was studied as a function of the growth temperature (565-635 deg. C) and the AlN mole fraction (0.01layer stoichiometry was determined by Rutherford backscattering spectrometry (RBS). RBS shows that indium incorporation decreased continuously with increasing growth temperature due to thermally enhanced dissociation of In-N bonds and for increasing AlN mole fractions. High resolution x-ray diffraction and transmission electron microscopy (TEM) measurements did not show evidence of phase separation. The mosaicity of the quaternary layers was found to be mainly determined by the growth temperature and independent on alloy composition within the range studied. However, depending on the AlN mole fraction, nanometer-sized composition fluctuations were detected by TEM. Photoluminescence spectra showed a single broad emission at room temperature, with energy and bandwidth S- and W-shaped temperature dependences typical of exciton localization by alloy inhomogeneities. Cathodoluminescence measurements demonstrated that the alloy inhomogeneities, responsible of exciton localization, occur on a lateral length scale below 150 nm, which is corroborated by TEM.

  18. Domain matched epitaxial growth of (111) Ba{sub 0.5}Sr{sub 0.5}TiO{sub 3} thin films on (0001) Al{sub 2}O{sub 3} with ZnO buffer layer

    SciTech Connect

    Krishnaprasad, P. S. E-mail: mkj@cusat.ac.in; Jayaraj, M. K. E-mail: mkj@cusat.ac.in; Antony, Aldrin; Rojas, Fredy

    2015-03-28

    Epitaxial (111) Ba{sub 0.5}Sr{sub 0.5}TiO{sub 3} (BST) thin films have been grown by pulsed laser deposition on (0001) Al{sub 2}O{sub 3} substrate with ZnO as buffer layer. The x-ray ω-2θ, Φ-scan and reciprocal space mapping indicate epitaxial nature of BST thin films. The domain matched epitaxial growth of BST thin films over ZnO buffer layer was confirmed using Fourier filtered high resolution transmission electron microscope images of the film-buffer interface. The incorporation of ZnO buffer layer effectively suppressed the lattice mismatch and promoted domain matched epitaxial growth of BST thin films. Coplanar inter digital capacitors fabricated on epitaxial (111) BST thin films show significantly improved tunable performance over polycrystalline thin films.

  19. Tin surface segregation, desorption, and island formation during post-growth annealing of strained epitaxial Ge1-xSnx layer on Ge(0 0 1) substrate

    NASA Astrophysics Data System (ADS)

    Wang, Wei; Li, Lingzi; Zhou, Qian; Pan, Jisheng; Zhang, Zheng; Tok, Eng Soon; Yeo, Yee-Chia

    2014-12-01

    Annealing of strained Ge1-xSnx epitaxial layers grown on Ge(0 0 1) substrate results in two distinctive regimes marked by changes in composition and morphology. Annealing at low temperatures (200-300 °C or Regime-I) leads to surface enrichment of Sn due to Sn segregation, as indicated by X-ray photoelectron spectroscopy (XPS) results, while the bulk Sn composition (from X-ray diffraction (XRD)) and the surface morphology (from atomic force microscopy (AFM)) do not show discernible changes as compared to the as-grown sample. Annealing at temperatures ranging from 300 °C to 500 °C (Regime-II) leads to a decrease in the surface Sn composition. While the Ge1-xSnx layer remains fully strained, a reduction in the bulk Sn composition is observed when the annealing temperature reaches 500 °C. At this stage, surface roughening also occurs with formation of 3D islands. The island size increases as the annealing temperature is raised to 600 °C. The decrease in the Sn composition at the surface and in the bulk in Regime-II is attributed to additional thermally activated kinetic processes associated with Sn desorption and formation of Sn-rich 3D islands on the surface.

  20. High In-content InGaN layers synthesized by plasma-assisted molecular-beam epitaxy: Growth conditions, strain relaxation, and In incorporation kinetics

    SciTech Connect

    Valdueza-Felip, S. Bellet-Amalric, E.; Pouget, S.; Monroy, E.; Wang, Y.; Chauvat, M.-P.; Ruterana, P.; Lorenz, K.; Alves, E.

    2014-12-21

    We report the interplay between In incorporation and strain relaxation kinetics in high-In-content In{sub x}Ga{sub 1-x}N (x = 0.3) layers grown by plasma-assisted molecular-beam epitaxy. For In mole fractions x = 0.13–0.48, best structural and morphological qualities are obtained under In excess conditions, at In accumulation limit, and at a growth temperature where InGaN decomposition is active. Under such conditions, in situ and ex situ analyses of the evolution of the crystalline structure with the layer thickness point to an onset of misfit relaxation after the growth of 40 nm, and a gradual relaxation during more than 200 nm, which results in an inhomogeneous strain distribution along the growth axis. This process is associated with a compositional pulling effect, i.e., indium incorporation is partially inhibited in presence of compressive strain, resulting in a compositional gradient with increasing In mole fraction towards the surface.

  1. Extremely low nonalloyed and alloyed contact resistance using an InAs cap layer on InGaAs by molecular-beam epitaxy

    NASA Technical Reports Server (NTRS)

    Peng, C. K.; Chen, J.; Chyi, J.; Morkoc, H.

    1988-01-01

    Extremely low alloyed and nonalloyed ohmic contact resistances have been formed on n-type InAs/In(0.53)Ga(0.47)As/In(0.52)Al(0.48)As structures grown on InP(Fe) by molecular-beam epitaxy. To insure the accuracy of the small contact resistances measured, an extended transmission line model was used to extrapolate contact resistances from test patterns with multiple gap spacings varying from 1 to 20 microns. For a 150-A-thick InAs layer doped to 2 x 10 to the 18th/cu cm and a 0.1-micron-thick InGaAs layer doped to 1 x 10 to the 18th/cu cm, a specific contact resistance of 2.6 x 10 to the -8th ohm-asterisk sq cm was measured for the nonalloyed contact, while a resistance less than 1.7 x 10 to the -8th ohm-asterisk sq cm is reported for the alloyed contact. Conventional Au-Ge/Ni/Au was used for the ohmic metal contact and alloying was performed at 500 C for 50 s in flowing H2. Using a thermionic field emission model, the barrier height at the InAs/InGaAs interface was calculated to be 20 meV.

  2. Optical and structural properties of GaN epitaxial layers on LiAlO2 substrates and their correlation with basal-plane stacking faults

    NASA Astrophysics Data System (ADS)

    Lutsenko, E. V.; Rzheutski, M. V.; Pavlovskii, V. N.; Yablonskii, G. P.; Alanzi, M.; Hamidalddin, A.; Alyamani, A.; Mauder, C.; Kalisch, H.; Reuters, B.; Heuken, M.; Vescan, A.; Naresh-Kumar, G.; Trager-Cowan, C.

    2016-01-01

    The optical and structural properties of m-plane GaN layers grown by metal organic vapor phase epitaxy on LiAlO2 (100) substrates were investigated. Temperature-dependent and time-resolved photoluminescence (PL), X-ray diffraction and Raman scattering measurements were performed to analyze the correlation of the sample properties with the density of I1-type basal-plane stacking faults (BSFs). Electron channeling contrast imaging was used to reveal and calculate the density of BSFs reaching the surface of an m-plane GaN/LiAlO2 layer. It was shown that a local increase of BSF density in the investigated samples results in a rise of the total PL efficiency at low temperatures because of the localization of excitons at BSFs and, therefore, a suppression of their diffusion to nonradiative centers. Parameters of time decay and temperature quenching of the BSF-related PL band were determined. A correlation of both εxx and εzz strain components with the BSFs and crystal mosaicity was observed, and possible reasons of this correlation are discussed.

  3. Elastic constants, Poisson ratios, and the elastic anisotropy of VN(001), (011), and (111) epitaxial layers grown by reactive magnetron sputter deposition

    NASA Astrophysics Data System (ADS)

    Mei, A. B.; Wilson, R. B.; Li, D.; Cahill, David G.; Rockett, A.; Birch, J.; Hultman, L.; Greene, J. E.; Petrov, I.

    2014-06-01

    Elastic constants are determined for single-crystal stoichiometric NaCl-structure VN(001), VN(011), and VN(111) epitaxial layers grown by magnetically unbalanced reactive magnetron sputter deposition on 001-, 011-, and 111-oriented MgO substrates at 430 °C. The relaxed lattice parameter ao = 0.4134 ± 0.0004 nm, obtained from high-resolution reciprocal space maps, and the mass density ρ = 6.1 g/cm3, determined from the combination of Rutherford backscattering spectroscopy and film thickness measurements, of the VN layers are both in good agreement with reported values for bulk crystals. Sub-picosecond ultrasonic optical pump/probe techniques are used to generate and detect VN longitudinal sound waves with measured velocities v001 = 9.8 ± 0.3, v011 = 9.1 ± 0.3, and v111 = 9.1 ± 0.3 km/s. The VN c11 elastic constant is determined from the sound wave velocity measurements as 585 ± 30 GPa; the c44 elastic constant, 126 ± 3 GPa, is obtained from surface acoustic wave measurements. From the combination of c11, c44, vhkl, and ρ we obtain the VN c12 elastic constant 178 ± 33 GPa, the VN elastic anisotropy A = 0.62, the isotropic Poisson ratio ν = 0.29, and the anisotropic Poisson ratios ν001 = 0.23, ν011 = 0.30, and ν111 = 0.29.

  4. Effects of high-flux low-energy ion bombardment on the low-temperature growth morphology of TiN(001) epitaxial layers

    SciTech Connect

    Karr, Brian W.; Cahill, David G.; Petrov, I.; Greene, J. E.

    2000-06-15

    Ultrahigh vacuum scanning tunneling microscopy (STM) is used to characterize the surface morphology of TiN(001) epitaxial layers grown by dc reactive magnetron sputtering at growth temperatures of T{sub s}=650 and T{sub s}=750 degree sign C. An auxiliary anode is used to bias the N{sub 2} plasma and produce a large flux of low-energy N{sub 2}{sup +} ions that bombard the film surface during growth: the ratio of the N{sub 2}{sup +} flux to the Ti growth flux is {approx_equal}25. At ion energies E{sub i} near the threshold for the production of bulk defects (E{sub i}=43 eV and T{sub s}=650 degree sign C), ion bombardment decreases the amplitude of the roughness, decreases the average distance between growth mounds, and reduces the sharpness of grooves between growth mounds. The critical island radius for second layer nucleation R{sub c} is approximately 12 and 17 nm at growth temperatures of 650 and 750 degree sign C respectively; at 650 degree sign C, R{sub c} is reduced to (approx =)10 nm by ion bombardment. (c) 2000 The American Physical Society.

  5. Epitaxial growth of ultrathin MgO layers on Fe3O4(0 0 1) films

    NASA Astrophysics Data System (ADS)

    Nordmann, T.; Kuschel, O.; Wollschläger, J.

    2016-09-01

    The initial growth stages of MgO on Fe3O4 films are studied by means of X-ray photoelectron spectroscopy and low energy electron diffraction to clarify stoichiometric and structural properties of these layered structures. This bilayer structure is important to fabricate high quality magnetic tunnel junctions based on Fe3O4 electrodes and MgO tunneling barriers. For this purpose, the deposition temperature of MgO has been varied between 100 °C and 250 °C. Initially, MgO grows layer-by-layer on Fe3O4/MgO(0 0 1) forming a wetting layer. Depending on the growth temperature, after growth of a 2-3 nm thick laminar wetting layer, the MgO films finally start to roughen during growth. Thus the growth of MgO on Fe3O4/MgO(0 0 1) is described by a Stranski-Krastanov growth mode. Diffraction experiments show that the magnetite (√{ 2} ×√{ 2})R45° superstructure is removed already during the initial stages of MgO deposition. Furthermore, these experiments show that MgO films are rougher for growth at low deposition temperatures.

  6. Spin-dependent tunneling in epitaxial Fe/Cr/MgO/Fe magnetic tunnel junctions with an ultrathin Cr(001) spacer layer

    NASA Astrophysics Data System (ADS)

    Matsumoto, Rie; Fukushima, Akio; Yakushiji, Kay; Nishioka, Shingo; Nagahama, Taro; Katayama, Toshikazu; Suzuki, Yoshishige; Ando, Koji; Yuasa, Shinji

    2009-05-01

    We fabricated fully epitaxial Fe/Cr/MgO/Fe(001) magnetic tunnel junctions (MTJs) with an atomically flat ultrathin Cr(001) layer grown below the MgO barrier layer and studied the spin-dependent transport to clarify scattering process of tunneling electrons. Because Cr does not have Bloch states with Δ1 symmetry at the Fermi energy (EF) , Δ1 evanescent states in MgO, which dominantly mediate the tunneling current, cannot couple with Cr Bloch states without a scattering process. The Fe/Cr/MgO/Fe(001) MTJs are therefore a model system for studying nonspecular scattering processes where the orbital symmetry of tunneling states is not conserved. The resistance-area (RA) product of the MTJs was found to not increase exponentially as a function of the Cr thickness (tCr) , indicating that the Cr layer does not act as a perfect tunnel barrier despite of the absence of Δ1 states at EF . Moreover, the magnetoresistance ratio of the MTJs was seen to oscillate as a function of tCr with a period of 2 monolayers, reflecting the layered antiferromagnetic structure of Cr(001). Surprisingly, the MR ratio showed local maxima at the odd numbers of Cr monolayers and local minima at the even numbers of Cr monolayers, indicating that the tunneling current is oppositely spin polarized with respect to the interface magnetization. These results suggest that nonspecular scatterings mediate the coupling between evanescent states in MgO and certain non- Δ1 Bloch states in Cr that have negative spin polarization, thereby inducing nonspecular tunneling current even at a low temperature and a small bias voltage. We also investigated, as a reference sample, Fe/MgO/Cr/Fe MTJs with a less-oxidized Cr/MgO interface by growing the Cr(001) layer on the MgO barrier layer and found that their RA product increased much more rapidly with increasing tCr . This indicates that partial oxidation of interface Cr atoms in the Fe/Cr/MgO/Fe MTJs is one of the major origins of nonspecular scatterings. Both an

  7. MEV ion beam induced epitaxial crystallization of Si0.99C0.01 layers on silicon

    NASA Astrophysics Data System (ADS)

    Rey, S.; Muller, D.; Grob, J. J.; Grob, A.; Stoquert, J. P.

    1997-02-01

    Multiple energy carbon ion implantation was used to form a 150 nm thick uniformly 1 at. %-doped layers in preamorphized silicon. Unlike conventional furnace annealing, inefficient up to 700 °C, a 1.5 MeV 84Kr+ bombardment is shown to induce the crystallization of such layers at temperatures ranging between 400 and 500 °C. RBS-channeling measurements have been used to estimate the crystallization velocity which is in the order of 10 nm per 1015cm-2. After complete recrystallization, the films have been characterized by Fourier Transform Infra-Red spectroscopy showing that the carbon atoms are neither located in substitutional position nor precipitated in SiC clusters. However, the carbon profile, measured by Secondary Ion Mass Spectroscopy is not modified by the process and oblique incidence channeling angular scans demonstrate that the layers are strained.

  8. A nitride-based epitaxial surface layer formed by ammonia treatment of silicene-terminated ZrB2.

    PubMed

    Wiggers, F B; Van Bui, H; Friedlein, R; Yamada-Takamura, Y; Schmitz, J; Kovalgin, A Y; de Jong, M P

    2016-04-01

    We present a method for the formation of an epitaxial  surface layer involving B, N, and Si atoms on a ZrB2(0001) thin film on Si(111). It has the potential to be an insulating growth template for 2D semiconductors. The chemical reaction of NH3 molecules with the silicene-terminated ZrB2  surface was characterized by synchrotron-based, high-resolution core-level photoelectron spectroscopy and low-energy electron diffraction. In particular, the dissociative chemisorption of NH3 at 400 °C leads to surface  nitridation, and subsequent annealing up to 830 °C results in a solid phase reaction with the ZrB2 subsurface layers. In this way, a new nitride-based epitaxial  surface layer is formed with hexagonal symmetry and a single in-plane crystal orientation. PMID:27059581

  9. Ion implanted epitaxially grown ZnSe

    NASA Technical Reports Server (NTRS)

    1974-01-01

    The epitaxial growth of ZnSe on (100) Ge using the close-spaced transport process is described. Substrate temperature of 575 C and source temperatures of 675 C yield 10 micron, single crystal layers in 10 hours. The Ge substrates provides a nonreplenishable chemical transport agent and the epitaxial layer thickness is limited to approximately 10 microns. Grown epitaxial layers show excellent photoluminescence structure at 77 K. Grown layers exhibit high resistivity, and annealing in Zn vapor at 575 C reduces the resistivity to 10-100 ohms-cm. Zinc vapor annealing quenches the visible photoluminescence.

  10. Epitaxial silicon growth for solar cells

    NASA Technical Reports Server (NTRS)

    Daiello, R. V.; Robinson, P. H.; Richman, D.

    1979-01-01

    The epitaxial procedures, solar cell fabrication, and evaluation techniques are described. The development of baseline epitaxial solar cell structures grown on high quality conventional silicon substrates is discussed. Diagnostic layers and solar cells grown on four potentially low cost silicon substrates are considered. The crystallographic properties of such layers and the performance of epitaxially grown solar cells fabricated on these materials are described. An advanced epitaxial reactor, the rotary disc, is described along with the results of growing solar cell structures of the baseline type on low cost substrates. The add on cost for the epitaxial process is assessed and the economic advantages of the epitaxial process as they relate to silicon substrate selection are examined.

  11. Degenerate electrical conductive and excitonic photoluminescence properties of epitaxial films of wide gap p-type layered oxychalcogenides, LnCuOCh (Ln=La, Pr and Nd; Ch=S or Se)

    NASA Astrophysics Data System (ADS)

    Hiramatsu, H.; Ueda, K.; Takafuji, K.; Ohta, H.; Hirano, M.; Kamiya, T.; Hosono, H.

    Electrical and photoluminescence properties were investigated for epitaxial films of layered oxychalcogenides, LnCuOCh (Ln=La, Pr, and Nd, Ch=S or Se). Epitaxial films of Mg 10 at.% doped LaCuOS1-xSex are the first demonstration of degenerate conduction with high hole concentration >1020 cm-3 in wide gap p-type semiconductors. Ion substitution varied the excitonic emission energy from 3.21 eV to 2.89 eV while lanthanide and chalcogenide ion substitutions displayed the opposite tendency against cell volume. These unique properties are discussed with respect to the electronic structure originating from the layered crystal structure.

  12. GaInN light-emitting diodes using separate epitaxial growth for the p-type region to attain polarization-inverted electron-blocking layer, reduced electron leakage, and improved hole injection

    SciTech Connect

    Meyaard, David S. Lin, Guan-Bo; Ma, Ming; Fred Schubert, E.; Cho, Jaehee; Han, Sang-Heon; Kim, Min-Ho; Shim, HyunWook; Sun Kim, Young

    2013-11-11

    A GaInN light-emitting diode (LED) structure is analyzed that employs a separate epitaxial growth for the p-type region, i.e., the AlGaN electron-blocking layer (EBL) and p-type GaN cladding layer, followed by wafer or chip bonding. Such LED structure has a polarization-inverted EBL and allows for uncompromised epitaxial-growth optimization of the p-type region, i.e., without the need to consider degradation of the quantum-well active region during p-type region growth. Simulations show that such an LED structure reduces electron leakage, reduces the efficiency droop, improves hole injection, and has the potential to extend high efficiencies into the green spectral region.

  13. Effects of dislocation strain on the epitaxy of lattice-mismatched AlGaInP layers

    NASA Astrophysics Data System (ADS)

    Mukherjee, K.; Beaton, D. A.; Mascarenhas, A.; Bulsara, M. T.; Fitzgerald, E. A.

    2014-04-01

    Strain fields arising from a non-uniform distribution of misfit dislocations in an underlying compositionally graded buffer are shown to be sufficiently strong to modify indium incorporation in III-phosphide light emitting layers. Composition fluctuations (xIn±0.02) in lattice-mismatched (AlyGa1-y)xIn1-xP thin films with length-scales of 5-10 μm and a broadened light emission spectra are observed. Cathodoluminescence, photoluminescence and wavelength dispersive x-ray spectroscopies are used in this analysis to generate spatial maps of luminescence spectra and element distributions in metal-organic chemical vapor deposition (MOCVD) grown films. It is seen that these fluctuations due to misfit dislocations are hard to eliminate via growth-kinetics alone but can be lowered through the use of miscut substrates or spacer layers between the graded buffer layer and the active layer. A link between crosshatch surface-roughness and group-III atom distribution under group-V rich growth conditions in both AlInP and GaInP films is also demonstrated. In summary, the interaction of the dislocation strain field with the growth surface can affect the optical characteristics of lattice-mismatched LEDs even if the final threading dislocation density is low.

  14. Raman scattering studies of strain effects in (100) and (311)B GaAs{sub 1−x}Bi{sub x} epitaxial layers

    SciTech Connect

    Steele, J. A. Lewis, R. A.; Henini, M.; Lemine, O. M.; Alkaoud, A.

    2013-11-21

    We report room-temperature Raman studies of strained (100) and (311)B GaAs{sub 1−x}Bi{sub x} epitaxial layers for x ≤ 0.039. The Raman spectra exhibit a two-mode behavior, as well as disorder-activated GaAs-like phonons. The experimental results show that the GaAs-like LO(Γ) mode experiences a strong composition-dependent redshift as a result of alloying. The peak frequency decreases linearly from the value for pure GaAs (∼293 cm{sup −1}) with the alloyed Bi fraction x and the introduced in-plane lattice strain ε{sub ∥}, by Δω{sub LO}=Δω{sub alloy}−Δω{sub strain}. X-ray diffraction measurements are used to determine x and ε{sub ∥} allowing Δω{sub alloy} to be decoupled and is estimated to be −12(±4) cm{sup −1}/x for (100) GaAs{sub 1−x}Bi{sub x}. Δω{sub LO} is measured to be roughly double for samples grown on (311)B-oriented substrates to that of (100) GaAs. This large difference in redshift is accounted for by examining the Bi induced strain, effects from alloying, and defects formed during high-index (311)B crystal growth.

  15. Hall-effect measurements of metalorganic vapor-phase epitaxy-grown p-type homoepitaxial GaN layers with various Mg concentrations

    NASA Astrophysics Data System (ADS)

    Horita, Masahiro; Takashima, Shinya; Tanaka, Ryo; Matsuyama, Hideaki; Ueno, Katsunori; Edo, Masaharu; Suda, Jun

    2016-05-01

    Mg-doped p-type gallium nitride (GaN) layers with doping concentrations in the range from 6.5 × 1016 cm‑3 (lightly doped) to 3.8 × 1019 cm‑3 (heavily doped) were investigated by Hall-effect measurement for the analysis of hole concentration and mobility. p-GaN was homoepitaxially grown on a GaN free-standing substrate by metalorganic vapor-phase epitaxy. The threading dislocation density of the p-GaN was 4 × 106 cm‑2 measured by cathodoluminescence mapping. Hall-effect measurements of p-GaN were carried out at a temperature in the range from 160 to 450 K. A low compensation ratio of less than 1% was revealed. We also obtained the depth of the Mg acceptor level of 235 meV considering the lowering effect by the Coulomb potential of ionized acceptors. The hole mobilities of 33 cm2 V‑1 s‑1 at 300 K and 72 cm2 V‑1 s‑1 at 200 K were observed in lightly doped p-GaN.

  16. Evolution of epilayer tilt in thick InxGa1-xAs metamorphic buffer layers grown by hydride vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Schulte, K. L.; Strand, M. T.; Kuech, T. F.

    2015-09-01

    Tilt behavior in thick InxGa1-xAs metamorphic buffer layers (MBLs) grown by hydride vapor phase epitaxy (HVPE) was measured by high-resolution reciprocal space mapping. Step-graded and continuously-graded structures, grown on nominally (001) oriented GaAs substrates, were analyzed. Tilt was measured as a function of position in a step-graded MBL. It was found that the tilt was strongest near the edges and tended to point toward the sample center. Step-grading induced a nearly linear tilt increase with xInAs, while tilt increased slowly below xInAs~0.10 then increased more sharply with In concentration in continuously-graded samples. The tilt behavior could be described by a model in which the tilt is attributed to imbalances in dislocations that result from cross-slip within a glide length of the sample edge. This finding implies that dislocation multiplication by cross slip is an important strain relief mechanism during the growth of these MBLs. Strategies for minimizing tilt in HVPE MBLs are discussed.

  17. Ultra-broadband terahertz time-domain ellipsometric spectroscopy utilizing GaP and GaSe emitters and an epitaxial layer transferred photoconductive detector

    SciTech Connect

    Yamashita, Masatsugu Takahashi, Hideki; Otani, Chiko; Ouchi, Toshihiko

    2014-02-03

    We present a reflection-type ultra-broadband terahertz (THz) time-domain spectroscopic ellipsometry system covering the frequency range of 0.5–30 THz. GaP (110) and z-cut GaSe crystals are used as emitters to generate the THz and mid-infrared pulses, respectively, and a photoconductive antenna switch using a low-temperature grown GaAs epitaxial layer transferred on Si substrate was used as a detector. By changing the emitter between the GaP and GaSe crystals, the measurable frequency range can be easily switched from the 0.5–7.8 THz range to the 7.8–30 THz range without additional optical alignment. We demonstrated the measurement of the dielectric function in a p-type InAs wafer and the optical conductivity of an indium tin oxide (ITO) thin film. The obtained carrier density and the mobility of the ITO thin film show good agreement with that obtained by the Hall measurement.

  18. Characteristics of GaN/Si(1 1 1) epitaxy grown using Al 0.1Ga 0.9N/AlN composite nucleation layers having different thicknesses of AlN

    NASA Astrophysics Data System (ADS)

    Jang, Seong-Hwan; Lee, Seung-Jae; Seo, In-Seok; Ahn, Haeng-Keun; Lee, Oh-Yeon; Leem, Jae-Young; Lee, Cheul-Ro

    2002-06-01

    We have studied the effects of Al 0.1Ga 0.9N(150 nm)/AlN composite nucleation layers (CNLs) having different thicknesses of AlN ranging from 20 to 41 nm on the growth characteristics of GaN/Si(1 1 1) epitaxy. The surface morphology of the GaN epitaxial layers which were grown on Al 0.1Ga 0.9N(150 nm)/AlN CNLs showed that the number of thermal etch pits and cracks were abruptly decreased with the increase of AlN thickness from 20 to 35 nm. However, the morphology of GaN epitaxy which was grown on Al 0.1Ga 0.9N(150 nm)/AlN CNL having AlN of thickness 41 nm above 35 nm showed that the number of etch pits increased again. The GaN/Si(1 1 1) epitaxy grown by using Al 0.1Ga 0.9N(150 nm)/AlN(35 nm) CNL showed that the highest crystallinity having a FWHM of 1157 arcsec for the (0 0 0 2) diffraction. Photoluminescence (PL) spectrum at room temperature for GaN/Si(1 1 1) epitaxy grown using Al 0.1Ga 0.9N(150 nm)/AlN(35 nm) CNL showed sharp band edge emission at 364 nm, which do not have yellow luminescence related to various defects such as vacancy and dislocation. The PL spectra at room temperature for the GaN layers grown using other CNLs showed yellow luminescence at around 580 nm in addition to the band edge emission. Moreover, the FWHM of the main exitonic peak at 10 K for the GaN/Si(1 1 1) epitaxy, which was grown using Al 0.1Ga 0.9N(150 nm)/AlN(35 nm) CNL, has the lowest value of 12.81 meV. It is obvious that the Al 0.1Ga 0.9N(150 nm)/AlN CNL having suitable thickness of AlN plays an important role in improving the crystallinity and optical properties of GaN/Si(1 1 1) heteroepitaxy without showing any defects such as pits and cracks over the surface by reducing the mismatch of thermal expansion coefficient and lattice constant between GaN and Si(1 1 1) compared with other nucleation layer such as Al xGa 1- xN or AlN alone.

  19. Metal-support interactions during the adsorption of CO on thin layers and islands of epitaxial palladium

    NASA Astrophysics Data System (ADS)

    Park, C.; Poppa, H.; Soria, F.

    1984-09-01

    Islands and continuous layers of palladium were grown in an ultrahigh vacuum on substrates of Mo(110)c(14 x 7)-O, designated MoO(x), and of clean Mo(110). It was found that as-deposited islands and layers exhibited bulk palladium adsorption properties for CO when deposited at room temperature and for palladium thicknesses in excess of about 3 monolayers. CO adsorption was drastically reduced, however, on annealing. For islands, annealing temperatures of as low as 400 K led to some reduction in CO adsorption whereas more severe reductions were found to occur at 600 K for islands and at 800 K for continuous multilayers. The deactivation depended on the palladium thickness, the substrate species and the extent of thermal treatments. Auger electron spectroscopy, temperature-programmed desorption and Delta-Phi measurements were combined to interpret the deactivation behavior in terms of substrate-support interactions involving the diffusion of substrate species towards the palladium surface.

  20. Metal-support interactions during the adsorption of CO on thin layers and islands of epitaxial palladium

    NASA Technical Reports Server (NTRS)

    Park, C.; Poppa, H.; Soria, F.

    1984-01-01

    Islands and continuous layers of palladium were grown in an ultrahigh vacuum on substrates of Mo(110)c(14 x 7)-O, designated MoO(x), and of clean Mo(110). It was found that as-deposited islands and layers exhibited bulk palladium adsorption properties for CO when deposited at room temperature and for palladium thicknesses in excess of about 3 monolayers. CO adsorption was drastically reduced, however, on annealing. For islands, annealing temperatures of as low as 400 K led to some reduction in CO adsorption whereas more severe reductions were found to occur at 600 K for islands and at 800 K for continuous multilayers. The deactivation depended on the palladium thickness, the substrate species and the extent of thermal treatments. Auger electron spectroscopy, temperature-programmed desorption and Delta-Phi measurements were combined to interpret the deactivation behavior in terms of substrate-support interactions involving the diffusion of substrate species towards the palladium surface.

  1. Formation of GaAs and Ga1-xAlxAs (0 ≤ x ≤ 0.3) layers on GaAs (111)A substrate by organometallic vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Larkin, S.; Avksentyev, A.; Vakiv, M.; Krukovsky, R.; Kost, Y.; Mykhashchuk, Y.; Krukovsky, S.; Saldan, I.

    2015-09-01

    The GaAs and Ga1-xAlxAs (0 ≤ x ≤ 0.3) epitaxial growth on GaAs (111)A substrate was carried out by organometallic vapor phase epitaxy at total pressure ˜70 Torr. The regime of quantitative modulation of trimethyl gallium, Ga(CH3)3, gas flow was applied to optimize the atomic ratio between AIII and BV, while the tangential and normal parameters of the growth rate were comparable. Deposited GaAs and Ga1-xAlxAs (0 ≤ x ≤ 0.3) layers with crystallographic orientation of (111)A were obtained at ˜0.1-0.2 Torr of arsine, AsH3, pressure and low crystallization temperature ˜570-620 °C. Proposed optimization of the BV/AIII relationship and reaction conditions resulted in a smooth surface of the deposited layers. Using the technological approach, a si-GaAs/n-GaAs:Si/p-GaAlAs:Zn/p+-GaAs:Zn hetero-structure was successfully synthesized. Structural and electrical properties of the prepared epitaxial structure were studied by high-resolution x-ray diffraction and electrochemical capacitance-voltage profiling. Obtained experimental results confirmed excellent crystal and interfacial quality as well as steep transitions in charge carrier concentration through the deposited layers.

  2. On the role of secondary extinction in the measurement of the integrated intensity of X-ray diffraction peaks and in the determination of the thickness of damaged epitaxial layers

    NASA Astrophysics Data System (ADS)

    Kyutt, R. N.

    2016-06-01

    The integrated intensity of X-ray diffraction reflections has been measured for a series of epitaxial layers of AIII nitrides (GaN, AlN, AlGaN) grown on different substrates (sapphire, SiC) and characterized by different degrees of structural perfection. It has been shown that, despite a high density of dislocations and a significant broadening of the diffraction peaks, the obtained values are not described by the kinematic theory of X-ray diffraction and suggest the existence of extinction. The results have been analyzed on the basis of the Darwin and Zachariasen extinction models. The secondary extinction coefficients and the thicknesses of epitaxial layers have been determined using two orders of reflection both in the Bragg geometry (0002 and 0004) and in the Laue geometry (10bar 10) and 10bar 20). It has been demonstrated that the secondary extinction coefficient is the greater, the smaller is the broadening of the diffraction peaks and, consequently, the dislocation density. It has been found that, for epitaxial layers with a regular system of threading dislocations, the secondary extinction coefficient for the Laue reflections is substantially greater than that for the Bragg reflections.

  3. Beam test results of a monolithic pixel sensor in the 0.18 μm tower-jazz technology with high resistivity epitaxial layer

    NASA Astrophysics Data System (ADS)

    Mattiazzo, S.; Aimo, I.; Baudot, J.; Bedda, C.; La Rocca, P.; Perez, A.; Riggi, F.; Spiriti, E.

    2015-10-01

    The ALICE experiment at CERN will undergo a major upgrade in the second Long LHC Shutdown in the years 2018-2019; this upgrade includes the full replacement of the Inner Tracking System (ITS), deploying seven layers of Monolithic Active Pixel Sensors (MAPS). For the development of the new ALICE ITS, the Tower-Jazz 0.18 μm CMOS imaging sensor process has been chosen as it is possible to use full CMOS in the pixel and different silicon wafers (including high resistivity epitaxial layers). A large test campaign has been carried out on several small prototype chips, designed to optimize the pixel sensor layout and the front-end electronics. Results match the target requirements both in terms of performance and of radiation hardness. Following this development, the first full scale chips have been designed, submitted and are currently under test, with promising results. A telescope composed of 4 planes of Mimosa-28 and 2 planes of Mimosa-18 chips is under development at the DAFNE Beam Test Facility (BTF) at the INFN Laboratori Nazionali di Frascati (LNF) in Italy with the final goal to perform a comparative test of the full scale prototypes. The telescope has been recently used to test a Mimosa-22THRb chip (a monolithic pixel sensor built in the 0.18 μm Tower-Jazz process) and we foresee to perform tests on the full scale chips for the ALICE ITS upgrade at the beginning of 2015. In this contribution we will describe some first measurements of spatial resolution, fake hit rate and detection efficiency of the Mimosa-22THRb chip obtained at the BTF facility in June 2014 with an electron beam of 500 MeV.

  4. A nitrilo-tri-acetic-acid/acetic acid route for the deposition of epitaxial cerium oxide films as high temperature superconductor buffer layers

    SciTech Connect

    Thuy, T.T.; Lommens, P.; Narayanan, V.; Van de Velde, N.; De Buysser, K.; Herman, G.G.; Cloet, V.; Van Driessche, I.

    2010-09-15

    A water based cerium oxide precursor solution using nitrilo-tri-acetic-acid (NTA) and acetic acid as complexing agents is described in detail. This precursor solution is used for the deposition of epitaxial CeO{sub 2} layers on Ni-5at%W substrates by dip-coating. The influence of the complexation behavior on the formation of transparent, homogeneous solutions and gels has been studied. It is found that ethylenediamine plays an important role in the gelification. The growth conditions for cerium oxide films were Ar-5% gas processing atmosphere, a solution concentration level of 0.25 M, a dwell time of 60 min at 900 {sup o}C and 5-30 min at 1050 {sup o}C. X-ray diffraction (XRD), scanning electron microscope (SEM), atomic force microscopy (AFM), pole figures and spectroscopic ellipsometry were used to characterize the CeO{sub 2} films with different thicknesses. Attenuated total reflection-Fourier transform infrared (ATR-FTIR) was used to determine the carbon residue level in the surface of the cerium oxide film, which was found to be lower than 0.01%. Textured films with a thickness of 50 nm were obtained. - Graphical abstract: Study of the complexation and hydrolysis behavior of Ce{sup 4+} ions in the presence of nitrilo-tri-acetic acid and the subsequent development of an aqueous chemical solution deposition route suited for the processing of textured CeO{sub 2} buffer layers on Ni-W tapes.

  5. Design and characterization of thick InxGa1-xAs metamorphic buffer layers grown by hydride vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Schulte, K. L.; Zutter, B. T.; Wood, A. W.; Babcock, S. E.; Kuech, T. F.

    2014-03-01

    Thick InxGa1-xAs metamorphic buffer layers (MBLs) grown by hydride vapor phase epitaxy (HVPE) were studied. Relationships between MBL properties and growth parameters such as grading rate, cap layer thickness, final xInAs, and deposition temperature (TD) were explored. The MBLs were characterized by measurement of in-plane residual strain (ɛ¦¦), surface etch pit density (EPD), and surface roughness. Capping layer thickness had a strong effect on strain relaxation, with thickly capped samples exhibiting the lowest ɛ¦¦. EPD was higher in samples with thicker caps, reflecting their increased relaxation through dislocation generation. ɛ¦¦ and EPD were weakly affected by the grading rate, making capping layer thickness the primary structural parameter which controls these properties. MBLs graded in discrete steps had similar properties to MBLs with continuous grading. In samples with identical thickness and 10-step grading style, ɛ¦¦ increased almost linearly with final xInAs, while total relaxation stayed relatively constant. Relaxation as a function of xInAs could be described by an equilibrium model in which dislocation nucleation is impeded by the energy of the existing dislocation array. EPD was constant from xInAs = 0 to 0.24 then increased exponentially, which is related to the increased dislocation interaction and blocking seen at higher dislocation densities. RMS roughness increased with xInAs above a certain strain rate (0.15%/µm) samples grown below this level possessed large surface hillocks and high roughness values. The elimination of hillocks at higher values of xInAs is attributed to increased density of surface steps and is related to the out-of-plane component of the burgers vector of the dominant type of 60° dislocation. TD did not affect ɛ¦¦ for samples with a given xInAs. EPD tended to increase with TD, indicating dislocation glide likely is impeded at higher temperatures.

  6. Reel-to-reel deposition of epitaxial double-sided MgO buffer layers for coated conductors

    NASA Astrophysics Data System (ADS)

    Xue, Yan; Xiong, Jie; Zhang, Yahui; Zhang, Fei; Zhao, Rui-Peng; Hui, Wang; Wang, Quiling; Cheng, Guo; Zhao, Xiao-Hui; Tao, Bo-Wan

    2016-06-01

    We have successfully employed a double-sided process to deposit MgO buffer layers on both sides of amorphous Y2O3 surface for double-sided YBa2Cu3O7-δ (YBCO) coated conductors (CCs) for the first time, the structure of which is of great prospect to improve the performance and cut the production cost. The biaxial textures of MgO buffer layer are noticeably affected by the ion energy and film thickness, which is demonstrated by X-ray diffraction. The best biaxial texture of double-sided MgO films shows ω-scan of (002) MgO and Φ-scan of (220) MgO yield full width at half maximum values of 4° and 7.8° for one side, respectively, as well as 3.5° and 6.7° for the other side. The subsequent double-sided YBCO films are deposited on the as-prepared MgO template with entire critical current of over 300 A/cm for both sides.

  7. Growth and Characterization of (211)B Cadmium Telluride Buffer Layer Grown by Metal-organic Vapor Phase Epitaxy on Nanopatterned Silicon for Mercury Cadmium Telluride Based Infrared Detector Applications

    NASA Astrophysics Data System (ADS)

    Shintri, Shashidhar S.

    Mercury cadmium telluride (MCT or Hg1-xCdxTe) grown by molecular beam epitaxy (MBE) is presently the material of choice for fabricating infrared (IR) detectors used in night vision based military applications. The focus of MCT epitaxy has gradually shifted since the last decade to using Si as the starting substrate since it offers several advantages. But the ˜19 % lattice mismatch between MCT and Si generates lots of crystal defects some of which degrade the performance of MCT devices. Hence thick CdTe films are used as buffer layers on Si to accommodate the defects. However, growth of high quality single crystal CdTe on Si is challenging and to date, the best MBE CdTe/Si reportedly has defects in the mid-105 cm -2 range. There is a critical need to reduce the defect levels by at least another order of magnitude, which is the main motivation behind the present work. The use of alternate growth technique called metal-organic vapor phase epitaxy (MOVPE) offers some advantages over MBE and in this work MOVPE has been employed to grow the various epitaxial films. In the first part of this work, conditions for obtaining high quality (211)B CdTe epitaxy on (211)Si were achieved, which also involved studying the effect of having additional intermediate buffer layers such as Ge and ZnTe and incorporation of in-situ thermal cyclic annealing (TCA) to reduce the dislocation density. A critical problem of Si cross-contamination due to 'memory effect' of different reactant species was minimized by introducing tertiarybutylArsine (TBAs) which resulted in As-passivation of (211)Si. The best 8-10 µm thick CdTe films on blanket (non-patterned) Si had dislocations around 3×105 cm-2, which are the best reported by MOVPE till date and comparable to the highest quality films available by MBE. In the second part of the work, nanopatterned (211)Si was used to study the effect of patterning on the crystal quality of epitaxial CdTe. In one such study, patterning of ˜20 nm holes in SiO2

  8. Dislocation density investigation on MOCVD-grown GaN epitaxial layers using wet and dry defect selective etching

    NASA Astrophysics Data System (ADS)

    Pandey, Akhilesh; Yadav, Brajesh S.; Rao, D. V. Sridhara; Kaur, Davinder; Kapoor, Ashok Kumar

    2016-06-01

    Results on the investigations of the dislocation etch pits in the GaN layers grown on sapphire substrate by metal organic chemical vapor deposition are revealed by wet chemical etching, and dry etching techniques are reported. The wet etching was carried out in molten KOH, and inductively coupled plasma (ICP) was used for dry etching. We show that ICP using dry etching and wet chemical etching using KOH solution under optimal conditions give values of dislocation density comparable to the one obtained from the high-resolution X-ray diffraction, atomic force microscopy and transmission electron microscopy investigations. Investigated threading dislocation density is in the order of ~109/cm2 using different techniques.

  9. Surface photoelectromotive Force in MIS structures based on Pb /SUB 1-x/ Sn /SUB x/ Te epitaxial layers

    SciTech Connect

    Antonov, V.V.; Kazak, E.P.; Matveenko, A.V.; Medvedev, Y.V.; Olesk, A.O.; Voitsekhouskii, A.V.

    1985-12-01

    This paper studies the surface properties of the narrow-band material Pb /SUB 1-x/ Sn /SUB x/ Te, using MIS structures in which either the anodic-oxide film (AOF) or an LiF layer served as the dielectric. The kinetics of the formation of AOF on Pb /SUB 1-x/ Sn /SUB x/ Te is illustrated. The MIS structures Ni (anodic-oxide-film) (LiF) Pb /SUB 1-x/ Sn /SUB x/ Te are characterized by the presence of a fixed positive charge in the dielectric, a mobile change in the anodic oxide, as well as the injection and capture of carriers in traps in the dielectric during optical excitation of MIS structures.

  10. Charged particle detection performances of CMOS pixel sensors produced in a 0.18 μm process with a high resistivity epitaxial layer

    NASA Astrophysics Data System (ADS)

    Senyukov, S.; Baudot, J.; Besson, A.; Claus, G.; Cousin, L.; Dorokhov, A.; Dulinski, W.; Goffe, M.; Hu-Guo, C.; Winter, M.

    2013-12-01

    The apparatus of the ALICE experiment at CERN will be upgraded in 2017/18 during the second long shutdown of the LHC (LS2). A major motivation for this upgrade is to extend the physics reach for charmed and beauty particles down to low transverse momenta. This requires a substantial improvement of the spatial resolution and the data rate capability of the ALICE Inner Tracking System (ITS). To achieve this goal, the new ITS will be equipped with 50 μm thin CMOS Pixel Sensors (CPS) covering either the three innermost layers or all the 7 layers of the detector. The CPS being developed for the ITS upgrade at IPHC (Strasbourg) is derived from the MIMOSA 28 sensor realised for the STAR-PXL at RHIC in a 0.35 μm CMOS process. In order to satisfy the ITS upgrade requirements in terms of readout speed and radiation tolerance, a CMOS process with a reduced feature size and a high resistivity epitaxial layer should be exploited. In this respect, the charged particle detection performance and radiation hardness of the TowerJazz 0.18 μm CMOS process were studied with the help of the first prototype chip MIMOSA 32. The beam tests performed with negative pions of 120 GeV/c at the CERN-SPS allowed to measure a signal-to-noise ratio (SNR) for the non-irradiated chip in the range between 22 and 32 depending on the pixel design. The chip irradiated with the combined dose of 1 MRad and 1013neq /cm2 was observed to yield an SNR ranging between 11 and 23 for coolant temperatures varying from 15 °C to 30 °C. These SNR values were measured to result in particle detection efficiencies above 99.5% and 98% before and after irradiation, respectively. These satisfactory results allow to validate the TowerJazz 0.18 μm CMOS process for the ALICE ITS upgrade.

  11. Epitaxial growth of mixed conducting layered Ruddlesden–Popper La{sub n+1}Ni{sub n}O{sub 3n+1} (n = 1, 2 and 3) phases by pulsed laser deposition

    SciTech Connect

    Wu, Kuan-Ting; Soh, Yeong-Ah; Skinner, Stephen J.

    2013-10-15

    Graphical abstract: - Highlights: • High quality epitaxial thin films of layered Ruddlesden–Popper nickelates were prepared. • For the first time this has been achieved by the PLD process. • n = 1, 2 and 3 films were successfully deposited on SrTiO{sub 3} and NdGaO{sub 3} substrates. • c-Axis oriented films were confirmed by XRD analysis. • In-plane and out-of-plane strain effects on lattice are discussed. - Abstract: Layered Ruddlesden–Popper phases of composition La{sub n+1}Ni{sub n}O{sub 3n+1} (n = 1, 2 and 3) have been epitaxially grown on SrTiO{sub 3} (0 0 1) or NdGaO{sub 3} (1 1 0) single crystal substrates using the pulsed laser deposition technique. X-ray diffraction analyses (θ/2θ, rocking curves, and φ-scans) and atomic force microscopy confirms the high-quality growth of the series of films with low surface roughness values (less than 1 nm). In particular, epitaxial growth of the higher order phases (n = 2 and 3) of lanthanum nickelate have been demonstrated for the first time.

  12. Polarization induced hole doping in graded Al{sub x}Ga{sub 1-x}N (x = 0.7 {approx} 1) layer grown by molecular beam epitaxy

    SciTech Connect

    Li, Shibin; Zhang, Ting; Wu, Jiang; Yang, Yajie; Wang, Zhiming; Wu, Zhiming; Chen, Zhi; Jiang, Yadong

    2013-02-11

    Polarization induced hole doping on the order of {approx}10{sup 18} cm{sup -3} is achieved in linearly graded Al{sub x}Ga{sub 1-x}N (x = 0.7 {approx} 1) layer grown by molecular beam epitaxy. Graded Al{sub x}Ga{sub 1-x}N and conventional Al{sub 0.7}Ga{sub 0.3}N layers grown on AlN are beryllium (Be) doped via epitaxial growth. The hole concentration in graded Al{sub x}Ga{sub 1-x}N:Be (x = 0.7 {approx} 1) layers demonstrates that polarization generates hole charges from Be dopant. The Al{sub 0.7}Ga{sub 0.3}N layer is not conductive owing to the absence of carriers generated from the Be dopant without the inducement of polarization. Polarization doping provides an approach to high efficiency p-type doping in high Al composition AlGaN.

  13. Epitaxial Deposition Of Germanium Doped With Gallium

    NASA Technical Reports Server (NTRS)

    Huffman, James E.

    1994-01-01

    Epitaxial layers of germanium doped with gallium made by chemical vapor deposition. Method involves combination of techniques and materials used in chemical vapor deposition with GeH4 or GeCl4 as source of germanium and GaCl3 as source of gallium. Resulting epitaxial layers of germanium doped with gallium expected to be highly pure, with high crystalline quality. High-quality material useful in infrared sensors.

  14. Formation of High-Quality, Epitaxial La2Zr2O7 Layers on Biaxially Textured Substrates by Slot-Die Coating of Chemical Solution Precursors

    SciTech Connect

    Wee, Sung Hun; Goyal, Amit; Hsu, Huey S; Li, Jing; Heatherly Jr, Lee; Kim, Kyunghoon; Aytug, Tolga; Sathyamurthy, Srivatsan; Paranthaman, Mariappan Parans

    2007-01-01

    Crystallization studies were performed of epitaxial La{sub 2}Zr{sub 2}O{sub 7} (LZO) films on biaxially textured Ni-3at.%W substrates having thin Y{sub 2}O{sub 3} (10 nm) seed layers. LZO films were deposited under controlled humid atmosphere using reel-to-reel slot-die coating of chemical solution precursors. Controlled crystallization under various processing conditions has revealed a broad phase space for obtaining high-quality, epitaxial LZO films without microcracks, with no degradation of crystallographic texture and with high surface crystallinity. Crack-free and strong c-axis aligned LZO films with no random orientation were obtained even at relatively low annealing temperatures of 850-950 C in flowing one atmosphere gas mixtures of Ar-4% H2 with an effective oxygen partial pressure of P(O2){approx}10{sup -22} atm. Texture and reflection high-energy electron diffraction analyses reveal that low-temperature-annealed samples have strong cube-on-cube epitaxy and high surface crystallinity, comparable to those of LZO film annealed at high temperature of 1100 C. In addition, these samples have a smoother surface morphology than films annealed at higher temperatures. Ni diffusion rate into the LZO buffer film is also expected to be significantly reduced at the lower annealing temperatures.

  15. Growth of ferroelectric Ba{sub 0.8}Sr{sub 0.2}TiO{sub 3} epitaxial films by ultraviolet pulsed laser irradiation of chemical solution derived precursor layers

    SciTech Connect

    Queraltó, A.; Pérez del Pino, A. Mata, M. de la; Tristany, M.; Gómez, A.; Obradors, X.; Puig, T.; Arbiol, J.

    2015-06-29

    Highly crystalline epitaxial Ba{sub 0.8}Sr{sub 0.2}TiO{sub 3} (BST) thin-films are grown on (001)-oriented LaNiO{sub 3}-buffered LaAlO{sub 3} substrates by pulsed laser irradiation of solution derived barium-zirconium-titanium precursor layers using a UV Nd:YAG laser source at atmospheric conditions. The structural analyses of the obtained films, studied by X-ray diffractometry and transmission electron microscopy, demonstrate that laser processing allows the growth of tens of nm-thick BST epitaxial films with crystalline structure similar to that of films obtained through conventional thermal annealing methods. However, the fast pulsed nature of the laser employed leads to crystallization kinetic evolution orders of magnitude faster than in thermal treatments. The combination of specific photothermal and photochemical mechanisms is the main responsible for the ultrafast epitaxial laser-induced crystallization. Piezoresponse microscopy measurements demonstrate equivalent ferroelectric behavior in laser and thermally annealed films, being the piezoelectric constant ∼25 pm V{sup −1}.

  16. Ge-related faceting and segregation during the growth of metastable (GaAs){sub 1{minus}x}(Ge{sub 2}){sub x} alloy layers by metal{endash}organic vapor-phase epitaxy

    SciTech Connect

    Norman, A.G.; Olson, J.M.; Geisz, J.F.; Moutinho, H.R.; Mason, A.; Al-Jassim, M.M.; Vernon, S.M.

    1999-03-01

    (GaAs){sub 1{minus}x}(Ge{sub 2}){sub x} alloy layers, 0{lt}x{lt}0.22, have been grown by metal{endash}organic vapor-phase epitaxy on vicinal (001) GaAs substrates. Transmission electron microscopy revealed pronounced phase separation in these layers, resulting in regions of GaAs-rich zinc-blende and Ge-rich diamond cubic material that appears to lead to substantial band-gap narrowing. For x=0.1 layers, the phase-separated microstructure consisted of intersecting sheets of Ge-rich material on {l_brace}115{r_brace}B planes surrounding cells of GaAs-rich material, with little evidence of antiphase boundaries. Atomic force microscopy revealed {l_brace}115{r_brace}B surface faceting associated with the phase separation. {copyright} {ital 1999 American Institute of Physics.}

  17. m-plane GaN layers grown by rf-plasma assisted molecular beam epitaxy with varying Ga/N flux ratios on m-plane 4H-SiC substrates

    SciTech Connect

    Armitage, R.; Horita, M.; Suda, J.; Kimoto, T.

    2007-02-01

    A series of m-plane GaN layers with the Ga beam-equivalent pressure (BEP) as the only varied parameter was grown by rf-plasma assisted molecular beam epitaxy on m-plane 4H-SiC substrates using AlN buffer layers. The smoothest growth surfaces and most complete film coalescence were found for the highest Ga BEP corresponding to the Ga droplet accumulation regime. However, better structural quality as assessed by x-ray rocking curves was observed for growth at a lower Ga BEP value below the droplet limit. The variation of rocking curve widths for planes inclined with respect to the epilayer c axis followed a different trend with Ga BEP than those of reflections parallel to the c axis. The GaN layers were found to exhibit a large residual compressive strain along the a axis.

  18. Digitally Alloyed Modulated Precursor Flow Epitaxial Growth of Ternary AlGaN with Binary AlN and GaN Sub-Layers and Observation of Compositional Inhomogeneity

    NASA Astrophysics Data System (ADS)

    Kim, Hee Jin; Choi, Suk; Yoo, Dongwon; Ryou, Jae-Hyun; Hawkridge, Michael E.; Liliental-Weber, Zuzanna; Dupuis, Russell D.

    2010-05-01

    We report the growth of ternary aluminum gallium nitride (AlGaN) layers on AlN/sapphire template/substrates by digitally alloyed modulated precursor flow epitaxial growth (DA-MPEG), which combined an MPEG AlN sub-layer with a conventional metalorganic chemical vapor deposition (MOCVD)-grown GaN sub-layer. The overall composition in DA-MPEG Al x Ga1- x N was controlled by adjustment of the growth time (i.e., the thickness) of the GaN sub-layer. As the GaN sub-layer growth time increased, the Al composition in AlGaN decreased to 50%, but the surface morphology of the AlGaN layer became rough, and a three-dimensional structure with islands appeared for the DA-MPEG AlGaN with relatively thick GaN sub-layers, possibly resulting from the Ga adatom surface migration behavior and/or the strain built up from lattice mismatch between AlN and GaN sub-layers with increasing GaN sub-layer growth time. Through strain analysis by high-resolution x-ray diffraction, reciprocal space mapping, and scanning transmission electron microscopy, it was found that there was compositional inhomogeneity in the DA-MPEG AlGaN with AlN and GaN binary sub-layers for the case of the layer with relatively thick GaN sub-layers.

  19. Epitaxial growth of europium monoxide on diamond

    SciTech Connect

    Melville, A.; Heeg, T.; Mairoser, T.; Schmehl, A.; Fischer, M.; Gsell, S.; Schreck, M.; Awschalom, D. D.; Holländer, B.; Schubert, J.; Schlom, D. G.

    2013-11-25

    We report the epitaxial integration of phase-pure EuO on both single-crystal diamond and on epitaxial diamond films grown on silicon utilizing reactive molecular-beam epitaxy. The epitaxial orientation relationship is (001) EuO ‖ (001) diamond and [110] EuO ‖[100] diamond. The EuO layer is nominally unstrained and ferromagnetic with a transition temperature of 68 ± 2 K and a saturation magnetization of 5.5 ± 0.1 Bohr magnetons per europium ion on the single-crystal diamond, and a transition temperature of 67 ± 2 K and a saturation magnetization of 2.1 ± 0.1 Bohr magnetons per europium ion on the epitaxial diamond film.

  20. Enhancing the orthorhombicity and antiferromagnetic-insulating state in epitaxial La0.67Ca0.33MnO3/NdGaO3(001) films by inserting a SmFeO3 buffer layer

    NASA Astrophysics Data System (ADS)

    Tan, Xuelian; Gao, Guanyin; Chen, Pingfan; Xu, Haoran; Zhi, Bowen; Jin, Feng; Chen, Feng; Wu, Wenbin

    2014-11-01

    Structural and magnetotransport properties of epitaxial La0.67Ca0.33MnO3(30 nm)/NdGaO3(001) [LCMO/NGO(001)] films are tuned by inserting an insulating SmFeO3 (SFO) buffer layer at various thicknesses (t). All the layers and the NGO substrates have the same Pbnm symmetry with the octahedra tilting about the b-axis, but different orthorhombicity (d). We found that as t increases, the fully strained (≤15 nm) or partially relaxed (30-60 nm) SFO layers can produce different d in the upper LCMO films. Correspondingly, the induced antiferromagnetic-insulating (AFI) state in LCMO is greatly enhanced with TAFI shifted from ˜250 K for t ≤ 15 nm to ˜263 K for t = 30-60 nm. We also show that the strain relaxation for t ≥ 30 nm is remarkably anisotropic, with a stable lattice constant a as that of the NGO substrates but increasing b of both SFO and LCMO layers. This indicates the octahedral coupling across the interfaces, leaving the strain along the a-axis accommodated by the octahedral tilts, while along the b-axis most probably by the octahedral deformations. The AFI state in the LCMO layer could be ascribed to the enhanced orthorhombicity with cooperatively increased Jahn-Teller-like distortions and tilting of the MnO6 octahedra. The results strongly suggest that the interfacial octahedral coupling plays a crucial role in epitaxial growth and in tuning functionalities of the perovskite oxide films.

  1. X-ray Microdiffraction from α-Ti0.04Fe1.96O3 (0001) Epitaxial Film Grown Over α-Cr2O3 Buffer Layer Boundary

    SciTech Connect

    Kim, Chang-Yong

    2011-07-01

    Ti-doped hematite (α-Ti0.04Fe1.96O3) film grown over patterned α-Cr2O3 buffer layer on α-Al2O3(0001) substrate was characterized with synchrotron X-ray microdiffraction. The film was grown by oxygen plasma assisted molecular beam epitaxy method. The film growth mode was correlated to buffer layer boundary and Ti concentration variation. Epitaxial α-Ti0.04Fe1.96O3 film was formed on bare substrate adjacent to the buffer layer. The epitaxial film was connected laterally to a strain-relaxed epitaxial α-Ti0.04Fe1.96O3 film grown on the buffer layer. On bare α-Al2O3 substrate with diminished Ti concentration only a small portion of α-TixFe1-xO3 film was epitaxial either as coherent to the substrate or strain-relaxed form.

  2. Growth kinetics and structural perfection of (InN)1/(GaN)1-20 short-period superlattices on +c-GaN template in dynamic atomic layer epitaxy

    NASA Astrophysics Data System (ADS)

    Kusakabe, Kazuhide; Hashimoto, Naoki; Itoi, Takaomi; Wang, Ke; Imai, Daichi; Yoshikawa, Akihiko

    2016-04-01

    The growth kinetics and structural perfection of (InN)1/(GaN)1-20 short-period superlattices (SPSs) were investigated with their application to ordered alloys in mind. The SPSs were grown on +c-GaN template at 650 °C by dynamic atomic layer epitaxy in conventional plasma-assisted molecular beam epitaxy. It was found that coherent structured InN/GaN SPSs could be fabricated when the thickness of the GaN barrier was 4 ML or above. Below 3 ML, the formation of SPSs was quite difficult owing to the increased strain in the SPS structure caused by the use of GaN as a template. The effective or average In composition of the (InN)1/(GaN)4 SPSs was around 10%, and the corresponding InN coverage in the ˜1 ML-thick InN wells was 50%. It was found that the effective InN coverage in ˜1 ML-thick InN wells could be varied with the growth conditions. In fact, the effective In composition could be increased up to 13.5%, i.e., the corresponding effective InN coverage was about 68%, by improving the capping/freezing speed by increasing the growth rate of the GaN barrier layer.

  3. 2D SWIR image sensor with extended wavelength cutoff of 2.5 μm on InP/InGaAs epitaxial wafers with graded buffer layers

    NASA Astrophysics Data System (ADS)

    Mushini, Prabhu; Huang, Wei; Morales, Manuel; Brubaker, Robert; Nguyen, Thuc-Uyen; Dobies, Matt; Zhang, Wei; Gustus, William; Mathews, Gary; Endicter, Scott; Paik, Namwoong

    2016-05-01

    Two-dimensional photo detector arrays with a cutoff wavelength of 2.5 μm were fabricated on InP/InGaAs epitaxial wafers with graded buffer layers in a 320x256 geometry on a 12.5μm pitch. Novel growth and fabrication techniques were employed to fabricate these arrays and optimize the performance. The dark current of the detector was investigated for a wide range of temperatures. The fabricated detector array was mated with a ROIC and packaged with a multi-stage TEC and investigated further at the FPA level. The effect of the graded buffer layers on the sensor performance was investigated and the results were compared to other methods used to develop and fabricate 2D image sensors on extended wavelength materials.

  4. Carrier dynamics in bulk 1eV InGaAsNSb materials and epitaxial lift off GaAs-InAlGaP layers grown by MOVPE for multi-junction solar cells

    NASA Astrophysics Data System (ADS)

    Sin, Yongkun; LaLumondiere, Stephen; Lotshaw, William; Moss, Steven C.; Kim, Tae Wan; Forghani, Kamran; Mawst, Luke J.; Kuech, Thomas F.; Tatavarti, Rao; Wibowo, Andree; Pan, Noren

    2013-03-01

    III-V multi-junction solar cells are based on a triple-junction design that consists of an InGaP top junction, a GaAs middle junction, and a bottom junction that employs either a 1eV material grown on the GaAs substrate or InGaAs grown on the Ge substrate. The most promising 1 eV material that is currently under extensive investigation is bulk dilute nitride such as InGaAsN(Sb) lattice matched to GaAs substrates. Both approaches utilizing dilute nitrides and lattice-mismatched InGaAs layers have a potential to achieve high performance triple-junction solar cells. In addition, it will be beneficial for both commercial and space applications if III-V triple-junction solar cells can significantly reduce weight and can be manufactured cost effectively while maintaining high efficiency. The most attractive approach to achieve these goals is to employ full-wafer epitaxial lift off (ELO) technology, which can eliminate the substrate weight and also enable multiple substrate re-usages. For the present study, we employed time-resolved photoluminescence (TR-PL) techniques to study carrier dynamics in MOVPE-grown bulk dilute nitride layers lattice matched to GaAs substrates, where carrier lifetime measurements are crucial in optimizing MOVPE materials growth. We studied carrier dynamics in InGaAsN(Sb) layers with different amounts of N incorporated. Carrier lifetimes were also measured from InGaAsN(Sb) layers at different stages of post-growth thermal annealing steps. Post-growth annealing yielded significant improvements in carrier lifetimes of InGaAsNSb double hetero-structure (DH) samples compared to InGaAsN DH samples possibly due to the surfactant effect of Sb. In addition, we studied carrier dynamics in MOVPE-grown GaAs-InAl(Ga)P layers grown on GaAs substrates. The structures were grown on top of a thin AlAs release layer, which allowed epitaxial layers grown on top of the AlAs layer to be removed from the substrate. The GaAs layers had various doping densities and

  5. Wafer-scale controlled exfoliation of metal organic vapor phase epitaxy grown InGaN/GaN multi quantum well structures using low-tack two-dimensional layered h-BN

    NASA Astrophysics Data System (ADS)

    Ayari, Taha; Sundaram, Suresh; Li, Xin; El Gmili, Youssef; Voss, Paul L.; Salvestrini, Jean Paul; Ougazzaden, Abdallah

    2016-04-01

    Recent advances in epitaxial growth have led to the growth of III-nitride devices on 2D layered h-BN. This advance has the potential for wafer-scale transfer to arbitrary substrates, which could improve the thermal management and would allow III-N devices to be used more flexibly in a broader range of applications. We report wafer scale exfoliation of a metal organic vapor phase epitaxy grown InGaN/GaN Multi Quantum Well (MQW) structure from a 5 nm thick h-BN layer that was grown on a 2-inch sapphire substrate. The weak van der Waals bonds between h-BN atomic layers break easily, allowing the MQW structure to be mechanically lifted off from the sapphire substrate using a commercial adhesive tape. This results in the surface roughness of only 1.14 nm on the separated surface. Structural characterizations performed before and after the lift-off confirm the conservation of structural properties after lift-off. Cathodoluminescence at 454 nm was present before lift-off and 458 nm was present after. Electroluminescence near 450 nm from the lifted-off structure has also been observed. These results show that the high crystalline quality ultrathin h-BN serves as an effective sacrificial layer—it maintains performance, while also reducing the GaN buffer thickness and temperature ramps as compared to a conventional two-step growth method. These results support the use of h-BN as a low-tack sacrificial underlying layer for GaN-based device structures and demonstrate the feasibility of large area lift-off and transfer to any template, which is important for industrial scale production.

  6. Incorporation of La in epitaxial SrTiO{sub 3} thin films grown by atomic layer deposition on SrTiO{sub 3}-buffered Si (001) substrates

    SciTech Connect

    McDaniel, Martin D.; Ngo, Thong Q.; Ekerdt, John G.; Posadas, Agham; Demkov, Alexander A.; Karako, Christine M.; Bruley, John; Frank, Martin M.; Narayanan, Vijay

    2014-06-14

    Strontium titanate, SrTiO{sub 3} (STO), thin films incorporated with lanthanum are grown on Si (001) substrates at a thickness range of 5–25 nm. Atomic layer deposition (ALD) is used to grow the La{sub x}Sr{sub 1−x}TiO{sub 3} (La:STO) films after buffering the Si (001) substrate with four-unit-cells of STO deposited by molecular beam epitaxy. The crystalline structure and orientation of the La:STO films are confirmed via reflection high-energy electron diffraction, X-ray diffraction, and cross-sectional transmission electron microscopy. The low temperature ALD growth (∼225 °C) and post-deposition annealing at 550 °C for 5 min maintains an abrupt interface between Si (001) and the crystalline oxide. Higher annealing temperatures (650 °C) show more complete La activation with film resistivities of ∼2.0 × 10{sup −2} Ω cm for 20-nm-thick La:STO (x ∼ 0.15); however, the STO-Si interface is slightly degraded due to the increased annealing temperature. To demonstrate the selective incorporation of lanthanum by ALD, a layered heterostructure is grown with an undoped STO layer sandwiched between two conductive La:STO layers. Based on this work, an epitaxial oxide stack centered on La:STO and BaTiO{sub 3} integrated with Si is envisioned as a material candidate for a ferroelectric field-effect transistor.

  7. Amorphous/epitaxial superlattice for thermoelectric application

    NASA Astrophysics Data System (ADS)

    Ishida, Akihiro; Thao, Hoang Thi Xuan; Shibata, Mamoru; Nakashima, Seisuke; Tatsuoka, Hirokazu; Yamamoto, Hidenari; Kinoshita, Yohei; Ishikiriyama, Mamoru; Nakamura, Yoshiaki

    2016-08-01

    An amorphous/epitaxial superlattice system is proposed for application to thermoelectric devices, and the superlattice based on a PbGeTeS system was prepared by the alternate deposition of PbS and GeTe using a hot wall epitaxy technique. The structure was analyzed by high-resolution transmission electron microscopy (HRTEM) and X-ray analysis, and it was found that the superlattice consists of an epitaxial PbTe-based layer and a GeS-based amorphous layer by the reconstruction of the constituents. A reduction in thermal conductivity due to the amorphous/epitaxial system was confirmed by a 2ω method. Electrical and thermoelectric properties were measured for the samples.

  8. Epitaxial silicon devices for dosimetry applications

    SciTech Connect

    Bruzzi, M.; Bucciolini, M.; Casati, M.; Menichelli, D.; Talamonti, C.; Piemonte, C.; Svensson, B. G.

    2007-04-23

    A straightforward improvement of the efficiency and long term stability of silicon dosimeters has been obtained with a n{sup +}-p junction surrounded by a guard-ring structure implanted on an epitaxial p-type Si layer grown on a Czochralski substrate. The sensitivity of devices made on 50-{mu}m-thick epitaxial Si degrades by only 7% after an irradiation with 6 MeV electrons up to 1.5 kGy, and shows no significant further decay up to 10 kGy. These results prove the enhanced radiation tolerance and stability of epitaxial diodes as compared to present state-of-the-art Si devices.

  9. Electroless epitaxial etching for semiconductor applications

    DOEpatents

    McCarthy, Anthony M.

    2002-01-01

    A method for fabricating thin-film single-crystal silicon on insulator substrates using electroless etching for achieving efficient etch stopping on epitaxial silicon substrates. Microelectric circuits and devices are prepared on epitaxial silicon wafers in a standard fabrication facility. The wafers are bonded to a holding substrate. The silicon bulk is removed using electroless etching leaving the circuit contained within the epitaxial layer remaining on the holding substrate. A photolithographic operation is then performed to define streets and wire bond pad areas for electrical access to the circuit.

  10. Epitaxial growth of Ca(x)Sr(1-x)F2 layers on CaF2 by vacuum evaporation

    NASA Astrophysics Data System (ADS)

    Norton, Nicholas G.; Knight, K. S.

    The evaporation and epitaxial growth on single crystal CaF2 substrates of CaF2/SrF2 mixtures are investigated. The evaporated films are studied with X-ray diffraction and optical microscopy. The X-ray diffraction results show that the evaporation of yCaF2(+) (1 - y)srF2 mixtures from a single boat, with y in the range 0 to 1, result in single phase, mixed crystals of composition CaxSr1-xF2. If Vegard's law is assumed to apply it is found experimentally that the film composition is the same as that of the source. For the evaporation of CaF2 and SrF2 onto cleaved CaF2 crystals it is shown that the best quality epitaxial films are obtained at substrate temperatures of 400 C. Over 400 C there is broadening of the X-ray diffraction spots from the overlayer compared with those from the substrate. Below 400 C there is a tendency for the epitaxial films to delaminate from the substrate.

  11. Method of depositing an electrically conductive oxide buffer layer on a textured substrate and articles formed therefrom

    DOEpatents

    Paranthaman, M. Parans; Aytug, Tolga; Christen, David K.

    2003-09-09

    An article with an improved buffer layer architecture includes a substrate having a textured metal surface, and an electrically conductive lanthanum metal oxide epitaxial buffer layer on the surface of the substrate. The article can also include an epitaxial superconducting layer deposited on the epitaxial buffer layer. An epitaxial capping layer can be placed between the epitaxial buffer layer and the superconducting layer. A method for preparing an epitaxial article includes providing a substrate with a metal surface and depositing on the metal surface a lanthanum metal oxide epitaxial buffer layer. The method can further include depositing a superconducting layer on the epitaxial buffer layer, and depositing an epitaxial capping layer between the epitaxial buffer layer and the superconducting layer.

  12. Method of depositing an electrically conductive oxide buffer layer on a textured substrate and articles formed therefrom

    DOEpatents

    Paranthaman, M. Parans; Aytug, Tolga; Christen, David K.

    2005-10-18

    An article with an improved buffer layer architecture includes a substrate having a textured metal surface, and an electrically conductive lanthanum metal oxide epitaxial buffer layer on the surface of the substrate. The article can also include an epitaxial superconducting layer deposited on the epitaxial buffer layer. An epitaxial capping layer can be placed between the epitaxial buffer layer and the superconducting layer. A method for preparing an epitaxial article includes providing a substrate with a metal surface and depositing on the metal surface a lanthanum metal oxide epitaxial buffer layer. The method can further include depositing a superconducting layer on the epitaxial buffer layer, and depositing an epitaxial capping layer between the epitaxial buffer layer and the superconducting layer.

  13. Domain epitaxy for thin film growth

    DOEpatents

    Narayan, Jagdish

    2005-10-18

    A method of forming an epitaxial film on a substrate includes growing an initial layer of a film on a substrate at a temperature T.sub.growth, said initial layer having a thickness h and annealing the initial layer of the film at a temperature T.sub.anneal, thereby relaxing the initial layer, wherein said thickness h of the initial layer of the film is greater than a critical thickness h.sub.c. The method further includes growing additional layers of the epitaxial film on the initial layer subsequent to annealing. In some embodiments, the method further includes growing a layer of the film that includes at least one amorphous island.

  14. Dopant in Near-Surface Semiconductor Layers of Metal-Insulator-Semiconductor Structures Based on Graded-Gap p-Hg0.78Cd0.22Te Grown by Molecular-Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Voitsekhovskii, A. V.; Nesmelov, S. N.; Dzyadukh, S. M.

    2016-02-01

    Peculiarities in determining the dopant concentration and dopant distribution profile in the near-surface layer of a semiconductor are investigated by measuring the admittance of metal-insulator-semiconductor structures (MIS structures) based on p-Hg0.78Cd0.22Te grown by molecular beam epitaxy. The dopant concentrations in the near-surface layer of the semiconductor are determined by measuring the admittance of MIS structures in the frequency range of 50 kHz to 1 MHz. It is shown that in this frequency range, the capacitance-voltage characteristics of MIS structures based on p-Hg0.78Cd0.22Te with a near-surface graded gap layer demonstrate a high-frequency behavior with respect to the recharge time of surface states located near the Fermi level for an intrinsic semiconductor. The formation time of the inversion layer is decreased by less than two times, if a near-surface graded-gap layer is created. The dopant distribution profile in the near-surface layer of the semiconductor is found, and it is shown that for structures based on p-Hg0.78Cd0.22Te with a near-surface graded-gap layer, the dopant concentration has a minimum near the interface with the insulator. For MIS structure based on n-Hg0.78Cd0.22Te, the dopant concentration is more uniformly distributed in the near-surface layer of the semiconductor.

  15. Epitaxial jumps

    NASA Astrophysics Data System (ADS)

    Stura, Enrico A.; Charbonnier, Jean-Baptiste; Taussig, Michael J.

    1999-01-01

    By a combination of seeding and changing the growth medium new crystal forms may be obtained. The procedure is called an epitaxial jump. The seeds used in the seeding are from crystals of the same or related protein. For example, seeding followed by an increase in precipitant concentration has given higher diffracting crystals of the complex between tissue factor, factor VIIa and the inhibitor 5L15. For both an anti-steroid antibody fragment and human placental alkaline phosphatase a polymorph was obtained by changing a low molecular weight polyethylene glycol (PEG) with one of a higher molecular weight. In the first case, in one direction and in the latter case, in the other direction. A change of conformation could also have contributed to this. A DsbA mutant illustrates how such changes, result in a different packing from that for the wild-type. Seeding from crystals of wild-type protein yields crystals which appear to be morphologically different from both the wild-type and mutant crystal forms.

  16. Reflection high-energy electron diffraction evaluation of thermal deoxidation of chemically cleaned Si, SiGe, and Ge layers for solid-source molecular beam epitaxy

    SciTech Connect

    Ali, Dyan; Richardson, Christopher J. K.

    2012-11-15

    The authors present a study on the thermal evolution of the reflection high-energy electron diffraction pattern of chemically cleaned (001)-oriented Si, Ge, and SiGe surfaces, associating observed changes in the reconstructions with the desorption of known residual contaminants for Si and Ge surfaces. The implications of residual oxides prior to epitaxy on stacking fault densities in the grown films are presented. Further evidence for the two-phase nature of oxides on SiGe surfaces is provided, demonstrating that it is necessary to heat a SiGe surface up to the thermal deoxidation temperature of a Si surface to obtain stacking fault-free growth.

  17. Junction Transport in Epitaxial Film Silicon Heterojunction Solar Cells: Preprint

    SciTech Connect

    Young, D. L.; Li, J. V.; Teplin, C. W.; Stradins, P.; Branz, H. M.

    2011-07-01

    We report our progress toward low-temperature HWCVD epitaxial film silicon solar cells on inexpensive seed layers, with a focus on the junction transport physics exhibited by our devices. Heterojunctions of i/p hydrogenated amorphous Si (a-Si) on our n-type epitaxial crystal Si on n++ Si wafers show space-charge-region recombination, tunneling or diffusive transport depending on both epitaxial Si quality and the applied forward voltage.

  18. Peculiarities of Determining the Dopant Concentration in the Near-Surface Layer of a Semiconductor by Measuring the Admittance of MIS Structures Based on P-Hg0.78Cd0.22Te Grown by Molecular Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Voitsekhovskii, A. V.; Nesmelov, S. N.; Dzyadukh, S. M.

    2016-06-01

    Peculiarities of determining the concentration and distribution profile of dopant in the near-surface layer of a semiconductor by measuring the admittance of MIS structures based on p-Hg0.78Cd0.22Te grown by molecular beam epitaxy are studied. A technique is proposed for the determining the concentration of dopant based on the measurement of the admittance of MIS structures in the frequency range of 50 kHz - 1 MHz. It is shown that in this frequency range, the capacitance-voltage characteristics of MIS structures based on p-Hg0.78Cd0.22Te with a near-surface graded-gap layer have a high- frequency behavior with respect to the recharge time of surface states located near the Fermi level of intrinsic semiconductor. The distribution profile of dopant in the nearsurface layer of the semiconductor is calculated. It is shown that in p-Hg0.78Cd0.22Te with a near-surface graded-gap layer, the dopant concentration has the lowest value near the interface with the insulator.

  19. Influence of microstructure and interfacial strain on the magnetic properties of epitaxial Mn3O4/La0.7Sr0.3MnO3 layered-composite thin films

    NASA Astrophysics Data System (ADS)

    Mukherjee, Devajyoti; Bingham, Nicholas; Hordagoda, Mahesh; Phan, Manh-Huong; Srikanth, Hariharan; Witanachchi, Sarath; Mukherjee, Pritish

    2012-10-01

    Epitaxial Mn3O4/La0.7Sr0.3MnO3 (Mn3O4/LSMO) bilayer thin films were grown on lattice-matched single crystal substrates of SrTiO3 (STO) (100) and MgO (100), with Mn3O4 as the top layer, using a pulsed laser deposition technique. X-ray diffraction (XRD) patterns revealed the single crystalline nature and epitaxial relationship between the layers. A detailed analysis of strains using XRD asymmetric/symmetric scans indicated an increasing in-plane compressive strain in the LSMO layer with increasing thicknesses of the Mn3O4 layer, resulting in a tetragonal distortion of the LSMO lattice in the Mn3O4/LSMO films in comparison to the tensile strains in LSMO single-layer films grown on both STO and MgO substrates. Cross-sectional high resolution transmission electron microscope (HRTEM) images showed atomically sharp interfaces in all films. However, as opposed to a flat interface between LSMO and STO, the Mn3O4 and LSMO interface was undulating and irregular in the bilayer films. Magnetic measurements revealed that relative to LSMO, the presence of Mn3O4 in Mn3O4/LSMO reduced the saturation magnetization at T > 50 K (the ferrimagnetic ordering temperature of Mn3O4) but enhanced it at T < 50 K. The decrease of the saturation magnetization in Mn3O4/LSMO for T > 50 K was associated with the appearance and increase of the compressive strain with the increase in Mn3O4 thickness. These observations point to the importance of a ferromagnetic-ferrimagnetic interfacial coupling between the LSMO and Mn3O4 layers in enhancing the surface magnetism of LSMO in the Mn3O4/LSMO bilayers. Our study provides useful information regarding the development of manganite composite thin films with improved magnetic properties for a wide range of technological applications, such as in spintronics and sensor devices.

  20. Calorimetry of epitaxial thin films.

    PubMed

    Cooke, David W; Hellman, F; Groves, J R; Clemens, B M; Moyerman, S; Fullerton, E E

    2011-02-01

    Thin film growth allows for the manipulation of material on the nanoscale, making possible the creation of metastable phases not seen in the bulk. Heat capacity provides a direct way of measuring thermodynamic properties of these new materials, but traditional bulk calorimetric techniques are inappropriate for such a small amount of material. Microcalorimetry and nanocalorimetry techniques exist for the measurements of thin films but rely on an amorphous membrane platform, limiting the types of films which can be measured. In the current work, ion-beam-assisted deposition is used to provide a biaxially oriented MgO template on a suspended membrane microcalorimeter in order to measure the specific heat of epitaxial thin films. Synchrotron x-ray diffraction showed the biaxial order of the MgO template. X-ray diffraction was also used to prove the high quality of epitaxy of a film grown onto this MgO template. The contribution of the MgO layer to the total heat capacity was measured to be just 6.5% of the total addenda contribution. The heat capacity of a Fe(.49)Rh(.51) film grown epitaxially onto the device was measured, comparing favorably to literature data on bulk crystals. This shows the viability of the MgO∕SiN(x)-membrane-based microcalorimeter as a way of measuring the thermodynamic properties of epitaxial thin films. PMID:21361612

  1. The impact of RF-plasma power in carrier relaxation dynamics of unintentional doped GaN epitaxial layers grown by MBE

    NASA Astrophysics Data System (ADS)

    Prakash, Nisha; Anand, Kritika; Barvat, Arun; Pal, Prabir; Singh, Dilip K.; Jewariya, Mukesh; Ragam, Srinivasa; Adhikari, Sonachand; Maurya, Kamlesh K.; Khanna, Suraj P.

    2016-04-01

    In this work, unintentionally doped GaN samples were prepared on GaN template by radio frequency (RF)-plasma MBE technique using two different RF-plasma powers. Photoluminescence (PL), steady state photoconductivity (PC) and ultrafast optical pump-probe spectroscopy measurements have been carried out to characterize the samples. The effect of RF-plasma power towards unintentional doping and giving rise to yellow luminescence (YL) is discussed. Our PC measurements show relatively faster decay for sample grown with higher RF-plasma power. In addition, the ultrafast optical pump-probe spectroscopy results show the presence of various defect levels with different relaxation times. A faster ultrafast relaxation time from the conduction band to the closest defect level and conduction band to the next defect level was observed for the sample grown with higher plasma power. A comparatively low defect density and faster carrier relaxation observed in higher RF-plasma power grown samples is caused by lower impurities and gallium vacancies. The results imply that RF-plasma power is very important parameter for the growth of epitaxial GaN films and undesirable impurities and gallium vacancies might get incorporated in the epitaxial GaN films.

  2. Temperature-dependent capacitance-voltage and current-voltage characteristics of Pt/Ga2O3 (001) Schottky barrier diodes fabricated on n--Ga2O3 drift layers grown by halide vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Higashiwaki, Masataka; Konishi, Keita; Sasaki, Kohei; Goto, Ken; Nomura, Kazushiro; Thieu, Quang Tu; Togashi, Rie; Murakami, Hisashi; Kumagai, Yoshinao; Monemar, Bo; Koukitu, Akinori; Kuramata, Akito; Yamakoshi, Shigenobu

    2016-03-01

    We investigated the temperature-dependent electrical properties of Pt/Ga2O3 Schottky barrier diodes (SBDs) fabricated on n--Ga2O3 drift layers grown on single-crystal n+-Ga2O3 (001) substrates by halide vapor phase epitaxy. In an operating temperature range from 21 °C to 200 °C, the Pt/Ga2O3 (001) Schottky contact exhibited a zero-bias barrier height of 1.09-1.15 eV with a constant near-unity ideality factor. The current-voltage characteristics of the SBDs were well-modeled by thermionic emission in the forward regime and thermionic field emission in the reverse regime over the entire temperature range.

  3. Engineering 180° ferroelectric domains in epitaxial PbTiO{sub 3} thin films by varying the thickness of the underlying (La,Sr)MnO{sub 3} layer

    SciTech Connect

    Jin, L.; Jia, C. L.; Vrejoiu, I.

    2014-09-29

    Epitaxial ferroelectric thin films of PbTiO{sub 3} (PTO) grown on top of nominally La{sub 0.7}Sr{sub 0.3}MnO{sub 3} (LSMO) submicron hillocks on Nb-doped SrTiO{sub 3} (100) substrate were investigated by means of scanning transmission electron microscopy. 180° ferroelectric domains were observed in the c-axis oriented PTO films. The formation and configuration of ferroelectric domains and domain walls were found to exhibit strong correlation with the thickness of the underlying LSMO hillocks. The domain walls start at the locations of the hillocks where the LSMO layer has a thickness of about 3 nm. Our results demonstrate that controlling the thickness variation (shape) of the LSMO hillocks can manipulate the position and density of the ferroelectric domain walls, which are considered to be the active elements for future nanoelectronics.

  4. Pure AlN layers in metal-polar AlGaN/AlN/GaN and AlN/GaN heterostructures grown by low-temperature ammonia-based molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Kaun, Stephen W.; Mazumder, Baishakhi; Fireman, Micha N.; Kyle, Erin C. H.; Mishra, Umesh K.; Speck, James S.

    2015-05-01

    When grown at a high temperature (820 °C) by ammonia-based molecular beam epitaxy (NH3-MBE), the AlN layers of metal-polar AlGaN/AlN/GaN heterostructures had a high GaN mole fraction (∼0.15), as identified by atom probe tomography in a previous study (Mazumder et al 2013 Appl. Phys. Lett. 102 111603). In the study presented here, growth at low temperature (<740 °C) by NH3-MBE yielded metal-polar AlN layers that were essentially pure at the alloy level. The improved purity of the AlN layers grown at low temperature was correlated to a dramatic increase in the sheet density of the two-dimensional electron gas (2DEG) at the AlN/GaN heterointerface. Through application of an In surfactant, metal-polar AlN(3.5 nm)/GaN and AlGaN/AlN(2.5 nm)/GaN heterostructures grown at low temperature yielded low 2DEG sheet resistances of 177 and 285 Ω/□, respectively.

  5. Properties of (GaIn)As and InP bulk epitaxial layers, (GaIn)As/InP-heterostructures and -pin-detector device structures grown by using the alternative sources ditertiarybutyl-arsine and ditertiarybutyl phosphine

    SciTech Connect

    Protzmann, H.; Hoehnsdorf, F.; Spika, Z.

    1996-12-31

    In this work the use of the novel ditertiarybutyl-phosphorus and -arsenic precursors for low pressure metalorganic vapor phase epitaxy (LP-MOVPE) application with respect to InP/(GaIn)As-heterostructures and pin-detector device structures has been studied. Layer quality has been investigated by means of optical and scanning electron microscopy, temperature dependent van der Pauw-Hall measurements, temperature dependent luminescence measurements, high resolution double crystal X-ray diffraction, XRD- and PL-mappings, CV-depth profiling and SIMS measurements. The InP/(GaIn)As-multi quantum well heterostructures exhibit narrow XRD-linewidths of both the main reflection peak as well as the superlattice satellite peaks down to the theoretical limit. The n-type background doping-level of the (GaIn)As layers is reduced to 2 {times} 10{sup 15} cm{sup {minus}3} for optimized growth conditions. The low temperature luminescence is characterized by intense and narrow exciton transitions (2--3 meV FWHM). A InP/(GaIn)As-layer structure has been processed to planar pin-diode detector structures of 55 {micro}m diameter. The devices show dark currents in the range of 1--1.5 nA at a reverse bias of {minus}5 V. The distribution of the I/U-characteristic is homogeneous over the entire processed wafer area. The device yield exceeds 95%.

  6. X-ray photoelectron spectroscopy studies of initial growth mechanism of CdTe layers grown on (100)GaAs by organometallic vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Sone, Syuji; Ekawa, Mitsuru; Yasuda, Kazuhito; Sugiura, Yoshiyuki; Saji, Manabu; Tanaka, Akikazu

    1990-02-01

    Variations of the GaAs surface conditions and the adsorption of the precursor elements of Cd and Te on the (100)GaAs substrate were studied by x-ray photoelectron spectroscopy at the initial stage of CdTe growth by organometallic vapor phase epitaxy. The stoichiometry of GaAs substrates was found to recover by annealing in the H2 environment (500 °C, 5 min), while the surface was initially in an As-rich condition after etching with H2SO4:H2O2:H2O (5:1:1). The preferential adsorption of Te on the GaAs surface was also observed. <100> oriented growth was obtained routinely when the GaAs surface was fully stabilized with Te after the H2 anneal under the above conditions. <111> oriented growth resulted when dimethylcadmium was first introduced after the anneal.

  7. Markedly distinct growth characteristics of semipolar (112{sup ¯}2) and (1{sup ¯}1{sup ¯}22{sup ¯}) InGaN epitaxial layers

    SciTech Connect

    Nishinaka, Junichi; Funato, Mitsuru; Kawakami, Yoichi

    2015-02-23

    We compare metalorganic vapor phase epitaxy of InGaN/GaN heterostructures on semipolar (112{sup ¯}2) and (1{sup ¯}1{sup ¯}22{sup ¯}) GaN bulk substrates. In incorporation efficiency is higher for (112{sup ¯}2) InGaN, which enables higher temperature growth of InGaN and is beneficial for quality improvement. InGaN/GaN quantum wells (QWs) on (112{sup ¯}2) show abrupt interfaces, but those on (1{sup ¯}1{sup ¯}22{sup ¯}) tend to form three-dimensional nanofacets. Differences in growth temperature and structures of the (112{sup ¯}2) and (1{sup ¯}1{sup ¯}22{sup ¯}) QWs cause higher internal quantum efficiencies of the (112{sup ¯}2) [(1{sup ¯}1{sup ¯}22{sup ¯})] QWs at shorter (longer) wavelengths.

  8. Epitaxial CoSi2 on MOS devices

    DOEpatents

    Lim, Chong Wee; Shin, Chan Soo; Petrov, Ivan Georgiev; Greene, Joseph E.

    2005-01-25

    An Si.sub.x N.sub.y or SiO.sub.x N.sub.y liner is formed on a MOS device. Cobalt is then deposited and reacts to form an epitaxial CoSi.sub.2 layer underneath the liner. The CoSi.sub.2 layer may be formed through a solid phase epitaxy or reactive deposition epitaxy salicide process. In addition to high quality epitaxial CoSi.sub.2 layers, the liner formed during the invention can protect device portions during etching processes used to form device contacts. The liner can act as an etch stop layer to prevent excessive removal of the shallow trench isolation, and protect against excessive loss of the CoSi.sub.2 layer.

  9. Method of deposition by molecular beam epitaxy

    DOEpatents

    Chalmers, S.A.; Killeen, K.P.; Lear, K.L.

    1995-01-10

    A method is described for reproducibly controlling layer thickness and varying layer composition in an MBE deposition process. In particular, the present invention includes epitaxially depositing a plurality of layers of material on a substrate with a plurality of growth cycles whereby the average of the instantaneous growth rates for each growth cycle and from one growth cycle to the next remains substantially constant as a function of time. 9 figures.

  10. Method of deposition by molecular beam epitaxy

    DOEpatents

    Chalmers, Scott A.; Killeen, Kevin P.; Lear, Kevin L.

    1995-01-01

    A method is described for reproducibly controlling layer thickness and varying layer composition in an MBE deposition process. In particular, the present invention includes epitaxially depositing a plurality of layers of material on a substrate with a plurality of growth cycles whereby the average of the instantaneous growth rates for each growth cycle and from one growth cycle to the next remains substantially constant as a function of time.

  11. Selective epitaxy using the GILD process

    SciTech Connect

    Weiner, K.H.

    1990-12-31

    The present invention comprises a method of selective epitaxy on a semiconductor substrate. The present invention provides a method of selectively forming high quality, thin GeSi layers in a silicon circuit, and a method for fabricating smaller semiconductor chips with a greater yield (more error free chips) at a lower cost. The method comprises forming an upper layer over a substrate, and depositing a reflectivity mask which is then removed over selected sections. Using a laser to melt the unmasked sections of the upper layer, the semiconductor material in the upper layer is heated and diffused into the substrate semiconductor material. By varying the amount of laser radiation, the epitaxial layer is formed to a controlled depth which may be very thin. When cooled, a single crystal epitaxial layer is formed over the patterned substrate. The present invention provides the ability to selectively grow layers of mixed semiconductors over patterned substrates such as a layer of Ge{sub x}Si{sub 1-x} grown over silicon. Such a process may be used to manufacture small transistors that have a narrow base, heavy doping, and high gain. The narrowness allows a faster transistor, and the heavy doping reduces the resistance of the narrow layer. The process does not require high temperature annealing; therefore materials such as aluminum can be used. Furthermore, the process may be used to fabricate diodes that have a high reverse breakdown voltage and a low reverse leakage current.

  12. Selective epitaxy using the gild process

    DOEpatents

    Weiner, Kurt H.

    1992-01-01

    The present invention comprises a method of selective epitaxy on a semiconductor substrate. The present invention provides a method of selectively forming high quality, thin GeSi layers in a silicon circuit, and a method for fabricating smaller semiconductor chips with a greater yield (more error free chips) at a lower cost. The method comprises forming an upper layer over a substrate, and depositing a reflectivity mask which is then removed over selected sections. Using a laser to melt the unmasked sections of the upper layer, the semiconductor material in the upper layer is heated and diffused into the substrate semiconductor material. By varying the amount of laser radiation, the epitaxial layer is formed to a controlled depth which may be very thin. When cooled, a single crystal epitaxial layer is formed over the patterned substrate. The present invention provides the ability to selectively grow layers of mixed semiconductors over patterned substrates such as a layer of Ge.sub.x Si.sub.1-x grown over silicon. Such a process may be used to manufacture small transistors that have a narrow base, heavy doping, and high gain. The narrowness allows a faster transistor, and the heavy doping reduces the resistance of the narrow layer. The process does not require high temperature annealing; therefore materials such as aluminum can be used. Furthermore, the process may be used to fabricate diodes that have a high reverse breakdown voltage and a low reverse leakage current.

  13. Conductivity and mobility profiles at 300 and 77 K of epitaxial Cd/sub chi/Hg/sub 1-chi/Te layers

    SciTech Connect

    Sangha, S.P.S.; Thompson, J.; Nicholls, R.E.; Smith, L.M. )

    1989-05-01

    The authors report the results of conductivity and mobility profiles of expitaxial layers of Cd/sub chi/Hg/sub 1-chi/Te at 300 and 77 {Kappa} obtained using the step and etch technique. In this technique, layers are sequentially stripped through chemical etching and differential Hall measurements are performed in the van der Pauw configuration.

  14. Pulsed growth techniques in plasma-assisted molecular beam epitaxy of AlxGa1-xN layers with medium Al content (x=0.4-0.6)

    NASA Astrophysics Data System (ADS)

    Nechaev, D. V.; Brunkov, P. N.; Troshkov, S. I.; Jmerik, V. N.; Ivanov, S. V.

    2015-09-01

    Paper presents the comparative analysis of Metal Modulated Epitaxy (MME) and Droplet Elimination by Thermal Annealing (DETA) techniques in the low-temperature plasma-assisted MBE of thick AlxGa1-xN layers with the medium Al content (x=0.4-0.6) grown under the highly metal-rich conditions. Atomically smooth surface with RMS of about 0.4 nm across the area of 2×2 μm2 has been achieved for AlGaN layers grown at FIII/FN flux ratio of 2.5 and substrate temperature of 700 °C by using DETA. The MME growth of AlGaN epilayers leads to their cracking due to the tensile stress introduced by relaxed GaN interlayers which are formed during the nitrogen exposure of the Ga-enriched AlGaN surface. A new technique based on IR-pyrometry measurements has been developed to monitor in situ metal accumulation and depletion on the growth surface.

  15. Epitaxial growth of Si deposited on (100) Si

    NASA Astrophysics Data System (ADS)

    Hung, L. S.; Lau, S. S.; von Allmen, M.; Mayer, J. W.; Ullrich, B. M.; Baker, J. E.; Williams, P.; Tseng, W. F.

    1980-11-01

    Epitaxial growth of deposited amorphous Si on chemically cleaned (100) Si has been found and layer-by-layer growth occurred at rates comparable to those in self-ion-implanted-amorphous Si. There is no evidence for appreciable oxygen penetration into the deposited layer during storage in air. The critical factors in achieving epitaxial growth are fast (˜50 Å/sec) deposition of Si onto a surface cleaned with a HF dip as a last rinse before loading into the vacuum system. Channeling and transmission electron microscopy measurements indicated that the epitaxial layers are essentially defect free. Secondary-ion mass spectroscopic analysis showed about 1014 oxygen/cm2 at the amorphous/crystal interface. With either higher interfacial oxygen coverage or slow (˜2 Å/sec) deposition, epitaxial growth rates are significantly slower.

  16. Nondestructive Characterization of Residual Threading Dislocation Density in HgCdTe Layers Grown on CdZnTe by Liquid-Phase Epitaxy

    NASA Astrophysics Data System (ADS)

    Fourreau, Y.; Pantzas, K.; Patriarche, G.; Destefanis, V.

    2016-05-01

    The performance of mercury cadmium telluride (MCT)-based infrared (IR) focal-plane arrays is closely related to the crystalline perfection of the HgCdTe thin film. In this work, Te-rich, (111)B-oriented HgCdTe epilayers grown by liquid-phase epitaxy on CdZnTe substrates have been studied. Surface atomic steps are shown on as-grown MCT materials using atomic force microscopy (AFM) and white-light interferometry (WLI), suggesting step-flow growth. Locally, quasiperfect surface spirals are also evidenced. A demonstration is given that these spirals are related to the emergence of almost pure screw threading dislocations. A nondestructive and quantitative technique to measure the threading dislocation density is proposed. The technique consists of counting the surface spirals on the as-grown MCT surface from images obtained by either AFM or WLI measurements. The benefits and drawbacks of both destructive—chemical etching of HgCdTe dislocations—and nondestructive surface imaging techniques are compared. The nature of defects is also discussed. Finally, state-of-the-art threading dislocation densities in the low 104 cm-2 range are evidenced by both etch pit density (EPD) and surface imaging measurements.

  17. Nondestructive Characterization of Residual Threading Dislocation Density in HgCdTe Layers Grown on CdZnTe by Liquid-Phase Epitaxy

    NASA Astrophysics Data System (ADS)

    Fourreau, Y.; Pantzas, K.; Patriarche, G.; Destefanis, V.

    2016-09-01

    The performance of mercury cadmium telluride (MCT)-based infrared (IR) focal-plane arrays is closely related to the crystalline perfection of the HgCdTe thin film. In this work, Te-rich, (111)B-oriented HgCdTe epilayers grown by liquid-phase epitaxy on CdZnTe substrates have been studied. Surface atomic steps are shown on as-grown MCT materials using atomic force microscopy (AFM) and white-light interferometry (WLI), suggesting step-flow growth. Locally, quasiperfect surface spirals are also evidenced. A demonstration is given that these spirals are related to the emergence of almost pure screw threading dislocations. A nondestructive and quantitative technique to measure the threading dislocation density is proposed. The technique consists of counting the surface spirals on the as-grown MCT surface from images obtained by either AFM or WLI measurements. The benefits and drawbacks of both destructive—chemical etching of HgCdTe dislocations—and nondestructive surface imaging techniques are compared. The nature of defects is also discussed. Finally, state-of-the-art threading dislocation densities in the low 104 cm-2 range are evidenced by both etch pit density (EPD) and surface imaging measurements.

  18. Characterization of interface reaction of Ti/Al-based ohmic contacts on AlGaN/GaN epitaxial layers on GaN substrate

    NASA Astrophysics Data System (ADS)

    Zadeh, Daryoush H.; Tanabe, Shinichi; Watanabe, Noriyuki; Matsuzaki, Hideaki

    2016-05-01

    The ohmic properties of Ti/Al/Mo/Au contacts on a high-quality AlGaN/GaN heterostructure epitaxially grown on a GaN substrate were investigated. Systematic structural and electrical analyses of the metal/AlGaN interface after annealing in N2 at 700 and 900 °C were conducted. After annealing at 900 °C, a new Al-rich interlayer with nitrogen vacancies was formed at the metal/AlGaN interface. Ohmic contacts with a low specific contact resistance (ρc) of 5.1 × 10‑6 Ω cm2 and a dominant field emission carrier transport mechanism were achieved. The fabrication of recessed-AlGaN-structured ohmic contact with ρc as low as 2.4 × 10‑5 Ω cm2 at a low annealing temperature of 650 °C, was also successfully demonstrated. This result indicates that a process methodology can be provided for fabricating low-resistivity ohmic contacts with a low thermal budget on a high-quality AlGaN/GaN structure, which is based on an appropriate control of the metal/AlGaN interface and AlGaN thickness rather than relying on the existence of threading dislocations.

  19. Encapsulated solid phase epitaxy of a Ge quantum well embedded in an epitaxial rare earth oxide.

    PubMed

    Laha, Apurba; Bugiel, E; Jestremski, M; Ranjith, R; Fissel, A; Osten, H J

    2009-11-25

    An efficient method based on molecular beam epitaxy has been developed to integrate an epitaxial Ge quantum well buried into a single crystalline rare earth oxide. The monolithic heterostructure comprised of Gd2O3-Ge-Gd2O3 grown on an Si substrate exhibits excellent crystalline quality with atomically sharp interfaces. This heterostructure with unique structural quality could be used for novel nanoelectronic applications in quantum-effect devices such as nanoscale transistors with a high mobility channel, resonant tunneling diode/transistors, etc. A phenomenological model has been proposed to explain the epitaxial growth process of the Ge layer under oxide encapsulation using a solid source molecular beam epitaxy technique. PMID:19875877

  20. Characterization of vertical Au/β-Ga2O3 single-crystal Schottky photodiodes with MBE-grown high-resistivity epitaxial layer

    NASA Astrophysics Data System (ADS)

    X, Z. Liu; C, Yue; C, T. Xia; W, L. Zhang

    2016-01-01

    High-resistivity β-Ga2O3 thin films were grown on Si-doped n-type conductive β-Ga2O3 single crystals by molecular beam epitaxy (MBE). Vertical-type Schottky diodes were fabricated, and the electrical properties of the Schottky diodes were studied in this letter. The ideality factor and the series resistance of the Schottky diodes were estimated to be about 1.4 and 4.6× 106 Ω. The ionized donor concentration and the spreading voltage in the Schottky diodes region are about 4 × 1018 cm-3 and 7.6 V, respectively. The ultra-violet (UV) photo-sensitivity of the Schottky diodes was demonstrated by a low-pressure mercury lamp illumination. A photoresponsivity of 1.8 A/W and an external quantum efficiency of 8.7 × 102% were observed at forward bias voltage of 3.8 V, the proper driving voltage of read-out integrated circuit for UV camera. The gain of the Schottky diode was attributed to the existence of a potential barrier in the i-n junction between the MBE-grown highly resistive β-Ga2O3 thin films and the n-type conductive β-Ga2O3 single-crystal substrate. Project supported by the National Nature Science Foundation of China (Grant No. 61223002) the Science and Technology Commission of Shanghai Municipality, China (Grant No. 13111103700), and the Specialized Research Fund for the Doctoral Program of Higher Education of China (Grant No. 2012018530003).

  1. Chemical vapor deposition of epitaxial silicon

    DOEpatents

    Berkman, Samuel

    1984-01-01

    A single chamber continuous chemical vapor deposition (CVD) reactor is described for depositing continuously on flat substrates, for example, epitaxial layers of semiconductor materials. The single chamber reactor is formed into three separate zones by baffles or tubes carrying chemical source material and a carrier gas in one gas stream and hydrogen gas in the other stream without interaction while the wafers are heated to deposition temperature. Diffusion of the two gas streams on heated wafers effects the epitaxial deposition in the intermediate zone and the wafers are cooled in the final zone by coolant gases. A CVD reactor for batch processing is also described embodying the deposition principles of the continuous reactor.

  2. Effect of Group-III precursors on unintentional gallium incorporation during epitaxial growth of InAlN layers by metalorganic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Kim, Jeomoh; Ji, Mi-Hee; Detchprohm, Theeradetch; Dupuis, Russell D.; Fischer, Alec M.; Ponce, Fernando A.; Ryou, Jae-Hyun

    2015-09-01

    Unintentional incorporation of gallium (Ga) in InAlN layers grown with different molar flow rates of Group-III precursors by metalorganic chemical vapor deposition has been experimentally investigated. The Ga mole fraction in the InAl(Ga)N layer was increased significantly with the trimethylindium (TMIn) flow rate, while the trimethylaluminum flow rate controls the Al mole fraction. The evaporation of metallic Ga from the liquid phase eutectic system between the pyrolized In from injected TMIn and pre-deposited metallic Ga was responsible for the Ga auto-incorporation into the InAl(Ga)N layer. The theoretical calculation on the equilibrium vapor pressure of liquid phase Ga and the effective partial pressure of Group-III precursors based on growth parameters used in this study confirms the influence of Group-III precursors on Ga auto-incorporation. More Ga atoms can be evaporated from the liquid phase Ga on the surrounding surfaces in the growth chamber and then significant Ga auto-incorporation can occur due to the high equilibrium vapor pressure of Ga comparable to effective partial pressure of input Group-III precursors during the growth of InAl(Ga)N layer.

  3. Effect of Group-III precursors on unintentional gallium incorporation during epitaxial growth of InAlN layers by metalorganic chemical vapor deposition

    SciTech Connect

    Kim, Jeomoh Ji, Mi-Hee; Detchprohm, Theeradetch; Dupuis, Russell D.; Fischer, Alec M.; Ponce, Fernando A.; Ryou, Jae-Hyun

    2015-09-28

    Unintentional incorporation of gallium (Ga) in InAlN layers grown with different molar flow rates of Group-III precursors by metalorganic chemical vapor deposition has been experimentally investigated. The Ga mole fraction in the InAl(Ga)N layer was increased significantly with the trimethylindium (TMIn) flow rate, while the trimethylaluminum flow rate controls the Al mole fraction. The evaporation of metallic Ga from the liquid phase eutectic system between the pyrolized In from injected TMIn and pre-deposited metallic Ga was responsible for the Ga auto-incorporation into the InAl(Ga)N layer. The theoretical calculation on the equilibrium vapor pressure of liquid phase Ga and the effective partial pressure of Group-III precursors based on growth parameters used in this study confirms the influence of Group-III precursors on Ga auto-incorporation. More Ga atoms can be evaporated from the liquid phase Ga on the surrounding surfaces in the growth chamber and then significant Ga auto-incorporation can occur due to the high equilibrium vapor pressure of Ga comparable to effective partial pressure of input Group-III precursors during the growth of InAl(Ga)N layer.

  4. Epitaxy of GaN Nanowires on Graphene.

    PubMed

    Kumaresan, Vishnuvarthan; Largeau, Ludovic; Madouri, Ali; Glas, Frank; Zhang, Hezhi; Oehler, Fabrice; Cavanna, Antonella; Babichev, Andrey; Travers, Laurent; Gogneau, Noelle; Tchernycheva, Maria; Harmand, Jean-Christophe

    2016-08-10

    Epitaxial growth of GaN nanowires on graphene is demonstrated using molecular beam epitaxy without any catalyst or intermediate layer. Growth is highly selective with respect to silica on which the graphene flakes, grown by chemical vapor deposition, are transferred. The nanowires grow vertically along their c-axis and we observe a unique epitaxial relationship with the ⟨21̅1̅0⟩ directions of the wurtzite GaN lattice parallel to the directions of the carbon zigzag chains. Remarkably, the nanowire density and height decrease with increasing number of graphene layers underneath. We attribute this effect to strain and we propose a model for the nanowire density variation. The GaN nanowires are defect-free and they present good optical properties. This demonstrates that graphene layers transferred on amorphous carrier substrates is a promising alternative to bulk crystalline substrates for the epitaxial growth of high quality GaN nanostructures. PMID:27414518

  5. Epitaxy: the motion picture

    NASA Astrophysics Data System (ADS)

    Finnie, Paul; Homma, Yoshikazu

    2002-03-01

    The engineering of many modern electronic devices demands control over a crystal down to the thickness of a single layer of atoms-and future demands will be even more challenging. Such control is achieved by the method of crystal growth known as epitaxy, and that makes this method the subject of intense study. More than that, recent advances are revolutionizing our knowledge of how surfaces grow. In fact, growing surfaces show a beautifully rich variety of phenomena, many of which are only now beginning to be uncovered. In the past few years many surface imaging techniques have been used to give us a close look at how crystals grow-while they are growing. The purpose of this article will be to illustrate some of the ways real surfaces grow and change as revealed by some of the latest in situ microscopic imaging technologies. It is often said that crystal growth is more of an art than a science. Here we will show that it is emphatically both.

  6. Conductive and robust nitride buffer layers on biaxially textured substrates

    DOEpatents

    Sankar, Sambasivan [Chicago, IL; Goyal, Amit [Knoxville, TN; Barnett, Scott A [Evanston, IL; Kim, Ilwon [Skokie, IL; Kroeger, Donald M [Knoxville, TN

    2009-03-31

    The present invention relates to epitaxial, electrically conducting and mechanically robust, cubic nitride buffer layers deposited epitaxially on biaxially textured substrates such as metals and alloys. The invention comprises of a biaxially textured substrate with epitaxial layers of nitrides. The invention also discloses a method to form such epitaxial layers using a high rate deposition method as well as without the use of forming gases. The invention further comprises epitaxial layers of oxides on the biaxially textured nitride layer. In some embodiments the article further comprises electromagnetic devices which may have superconducting properties.

  7. Conductive and robust nitride buffer layers on biaxially textured substrates

    DOEpatents

    Sankar, Sambasivan; Goyal, Amit; Barnett, Scott A.; Kim, Ilwon; Kroeger, Donald M.

    2004-08-31

    The present invention relates to epitaxial, electrically conducting and mechanically robust, cubic nitride buffer layers deposited epitaxially on biaxially textured substrates such as metal and alloys. The invention comprises of a biaxially textured substrate with epitaxial layers of nitrides. The invention also discloses a method to form such epitaxial layers using a high rate deposition method as well as without the use of forming gases. The invention further comprises epitaxial layers of oxides on the biaxially textured nitride layers. In some embodiments the article further comprises electromagnetic devices which may be super conducting properties.

  8. Epitaxial solar-cell fabrication, phase 2

    NASA Technical Reports Server (NTRS)

    Daiello, R. V.; Robinson, P. H.; Kressel, H.

    1977-01-01

    Dichlorosilane (SiH2Cl2) was used as the silicon source material in all of the epitaxial growths. Both n/p/p(+) and p/n/n(+) structures were studied. Correlations were made between the measured profiles and the solar cell parameters, especially cell open-circuit voltage. It was found that in order to obtain consistently high open-circuit voltage, the epitaxial techniques used to grow the surface layer must be altered to obtain very abrupt doping profiles in the vicinity of the junction. With these techniques, it was possible to grow reproducibly both p/n/n(+) and n/p/p(+) solar cell structures having open-circuit voltages in the 610- to 630-mV range, with fill-factors in excess of 0.80 and AM-1 efficiencies of about 13%. Combinations and comparisons of epitaxial and diffused surface layers were also made. Using such surface layers, we found that the blue response of epitaxial cells could be improved, resulting in AM-1 short-circuit current densities of about 30 mA/cm sq. The best cells fabricated in this manner had AM-1 efficiency of 14.1%.

  9. An ab initio study of MgO epitaxial layers on a Co2MnSi (0 0 1) surface: influence of the interface structure on tunnelling conductance

    NASA Astrophysics Data System (ADS)

    Yu, H. L.; Jiang, X. F.; Zheng, Y.; Yang, G. W.

    2012-08-01

    The formation of MgO epitaxial layers on a Co2MnSi (0 0 1) surface was studied using the ab initio electronic structure calculations based on the density functional theory. The free energy calculations showed that the O-rich, O-top and Mg-rich configurations in the CoCo termination case, and the O-rich and O-top configurations in the MnSi termination case were thermodynamically stable. The magnetic and electronic properties of these stable configurations were investigated in detail, and the results indicated that only the Mg-rich configuration with CoCo termination exhibited near half-metallic properties at the interface. The influence of the interfacial structure on the tunnelling conductance of the Co2MnSi/MgO/Co2MnSi magnetic tunnel junctions (MTJs) was also discussed using the nonequilibrium Green's function method. The attained conductance showed that a large difference of up to 104 was observed in the magnitude of parallel conductance, which means that the interface structure plays a crucial role in the electronic transport of the MTJ. These findings are useful in designing MTJs with high performance.

  10. Crystal orientation dependence of current-perpendicular-to-plane giant magnetoresistance of pseudo spin-valves with epitaxial Co{sub 2}Fe(Ge{sub 0.5}Ga{sub 0.5}) Heusler alloy layers

    SciTech Connect

    Chen, Jiamin; Hono, K.; Li, Songtian; Furubayashi, T. Takahashi, Y. K.

    2014-06-21

    The magnetoresistive (MR) properties of Co{sub 2}Fe(Ge{sub 0.5}Ga{sub 0.5}) (CFGG) Heusler alloy-based current-perpendicular-to-plane giant magnetoresistance pseudo-spin-valves (PSVs) are investigated. The PSV films are epitaxially grown on a sapphire (112{sup ¯}0) substrate with an Ag or Cu spacer layer, and their magnetoresistive properties are compared with those of PSV grown on MgO(001) substrates. For substrates with an Ag spacer, the PSV with the (001)[110]{sub CFGG}//(001)[010]{sub Ag} interface grown on MgO(001) exhibits a higher MR output compared with the (110)[001]{sub CFGG}//(111)[11{sup ¯}0]{sub Ag} interface grown on sapphire (112{sup ¯}0). In contrast, a higher MR output is obtained using a Cu spacer with the (110)[001]{sub CFGG}//(111)[11{sup ¯}0]{sub Cu} interface. These results demonstrate that the MR outputs depend upon the crystal orientation at the interface, and that interfaces with a small misfit tend to exhibit a larger MR output. This indicates the influence of crystal orientation as well as lattice mismatch upon the interfacial spin scattering asymmetry.

  11. Investigation of interfacial roughness of In sub x Ga sub 1 minus x As epitaxial layers on GaAs and InP substrates by soft x-ray reflectivity

    SciTech Connect

    Krol, A.; Resat, H.; Sher, C.J.; Woronick, S.C.; Ng, W.; Kao, Y.H. ); Cole, T.L.; Green, A.K.; Lowe-Ma, C.K.; Nee, T.; Rehn, V. )

    1991-01-15

    The grazing incidence x-ray reflectivity is a nondestructive and sensitive technique for probing the depth profile of electron density in layered structures. This method has been utilized in the soft x-ray regime to determine the roughness of interfaces, and the epilayer thickness in In{sub {ital x}}Ga{sub 1{minus}{ital x}}As/InP and In{sub {ital x}}Ga{sub 1{minus}{ital x}}As/GaAs heterostructures, for {ital x}=0.57 and {ital x}=0.60, grown by molecular beam epitaxy. By fitting the experimental results to our model, assuming uncorrelated interfacial roughness, we conclude that the top surface roughness does not depend on the type of the substrate or presence of stress in the epilayer, and is always smaller than interfacial roughness. The main factors which control the interfacial roughness are the quality of substrate and/or growth conditions rather than strain or lattice mismatch.

  12. Structural and morphological properties of GaN buffer layers grown by ammonia molecular beam epitaxy on SiC substrates for AlGaN/GaN high electron mobility transistors

    SciTech Connect

    Corrion, A. L.; Poblenz, C.; Wu, F.; Speck, J. S.

    2008-05-01

    The impact of growth conditions on the surface morphology and structural properties of ammonia molecular beam epitaxy GaN buffers layers on SiC substrates was investigated. The threading dislocation (TD) density was found to decrease with decreasing NH{sub 3}:Ga flux ratio, which corresponded to an increase in surface roughness and reduction in residual compressive lattice mismatch stress. Furthermore, the dislocation density and compressive stress decreased for increasing buffer thickness. TD inclination was proposed to account for these observations. Optimized surface morphologies were realized at high NH{sub 3}:Ga flux ratios and were characterized by monolayer-high steps, spiral hillocks, and pyramidal mounds, with rms roughness of {approx}1.0 nm over 2x2 {mu}m{sup 2} atomic force microscopy images. Smooth surface morphologies were realized over a large range of growth temperatures and fluxes, and growth rates of up to 1 {mu}m/h were achieved. TD densities in the buffers as low as 3x10{sup 9} cm{sup -2} were demonstrated. These buffers were highly insulating and were used in recently reported AlGaN/GaN HEMTs with power densities of >11 W/mm at 4 and 10 GHz.

  13. Cosine (Cobalt Silicide Growth Through Nitrogen-Induced Epitaxy) Process For Epitaxial Cobalt Silicide Formation For High Performance Sha

    DOEpatents

    Lim, Chong Wee; Shin, Chan Soo; Gall, Daniel; Petrov, Ivan Georgiev; Greene, Joseph E.

    2004-09-28

    A method for forming an epitaxial cobalt silicide layer on a MOS device includes sputter depositing cobalt in an ambient to form a first layer of cobalt suicide on a gate and source/drain regions of the MOS device. Subsequently, cobalt is sputter deposited again in an ambient of argon to increase the thickness of the cobalt silicide layer to a second thickness.

  14. Rapid low-temperature epitaxial growth using a hot-element assisted chemical vapor deposition process

    DOEpatents

    Iwancizko, Eugene; Jones, Kim M.; Crandall, Richard S.; Nelson, Brent P.; Mahan, Archie Harvin

    2001-01-01

    The invention provides a process for depositing an epitaxial layer on a crystalline substrate, comprising the steps of providing a chamber having an element capable of heating, introducing the substrate into the chamber, heating the element at a temperature sufficient to decompose a source gas, passing the source gas in contact with the element; and forming an epitaxial layer on the substrate.

  15. Epitaxial growth of three dimensionally structured III-V photonic crystal via hydride vapor phase epitaxy

    SciTech Connect

    Zheng, Qiye; Kim, Honggyu; Zhang, Runyu; Zuo, Jianmin; Braun, Paul V.; Sardela, Mauro; Balaji, Manavaimaran; Lourdudoss, Sebastian; Sun, Yan-Ting

    2015-12-14

    Three-dimensional (3D) photonic crystals are one class of materials where epitaxy, and the resultant attractive electronic properties, would enable new functionalities for optoelectronic devices. Here we utilize self-assembled colloidal templates to fabricate epitaxially grown single crystal 3D mesostructured Ga{sub x}In{sub 1−x}P (GaInP) semiconductor photonic crystals using hydride vapor phase epitaxy (HVPE). The epitaxial relationship between the 3D GaInP and the substrate is preserved during the growth through the complex geometry of the template as confirmed by X-ray diffraction (XRD) and high resolution transmission electron microscopy. XRD reciprocal space mapping of the 3D epitaxial layer further demonstrates the film to be nearly fully relaxed with a negligible strain gradient. Fourier transform infrared spectroscopy reflection measurement indicates the optical properties of the photonic crystal which agree with finite difference time domain simulations. This work extends the scope of the very few known methods for the fabrication of epitaxial III-V 3D mesostructured materials to the well-developed HVPE technique.

  16. Epitaxial growth of three dimensionally structured III-V photonic crystal via hydride vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Zheng, Qiye; Kim, Honggyu; Zhang, Runyu; Sardela, Mauro; Zuo, Jianmin; Balaji, Manavaimaran; Lourdudoss, Sebastian; Sun, Yan-Ting; Braun, Paul V.

    2015-12-01

    Three-dimensional (3D) photonic crystals are one class of materials where epitaxy, and the resultant attractive electronic properties, would enable new functionalities for optoelectronic devices. Here we utilize self-assembled colloidal templates to fabricate epitaxially grown single crystal 3D mesostructured GaxIn1-xP (GaInP) semiconductor photonic crystals using hydride vapor phase epitaxy (HVPE). The epitaxial relationship between the 3D GaInP and the substrate is preserved during the growth through the complex geometry of the template as confirmed by X-ray diffraction (XRD) and high resolution transmission electron microscopy. XRD reciprocal space mapping of the 3D epitaxial layer further demonstrates the film to be nearly fully relaxed with a negligible strain gradient. Fourier transform infrared spectroscopy reflection measurement indicates the optical properties of the photonic crystal which agree with finite difference time domain simulations. This work extends the scope of the very few known methods for the fabrication of epitaxial III-V 3D mesostructured materials to the well-developed HVPE technique.

  17. Preferentially Etched Epitaxial Liftoff of InP Material

    NASA Technical Reports Server (NTRS)

    Bailey, Sheila G. (Inventor); Wilt, David M. (Inventor); DeAngelo, Frank L. (Inventor)

    1997-01-01

    The present invention is directed toward a method of removing epitaxial substrates from host substrates. A sacrificial release layer of ternary material is placed on the substrate. A layer of InP is then placed on the ternary material. Afterward a layer of wax is applied to the InP layer to apply compressive force and an etchant material is used to remove the sacrificial release layer.

  18. The electrical, optical, and structural properties of GaN epitaxial layers grown on Si(111) substrate with SiN interlayers

    NASA Astrophysics Data System (ADS)

    Arslan, Engin; Duygulu, Özgür; Kaya, Ali Arslan; Teke, Ali; Özçelik, Süleyman; Ozbay, Ekmel

    2009-12-01

    The effect of the in situ substrate nitridation time on the electrical, structural and optical properties of GaN films grown on Si(111) substrates by metal organic chemical vapor deposition (MOCVD) was investigated. A thin buffer layer of silicon nitride (SiN x) with various thicknesses was achieved through the nitridation of the substrate at different nitridation times ranging from 0 to 660 s. The surface roughness of the GaN film, which was grown on the Si substrate 10 s, exhibited a root mean square (RMS) value of 1.12 nm for the surface roughness. However, further increments in the nitridation times in turn cause increments in the surface roughness in the GaN layers. The number of threading dislocation (TD) was counted from plan-view TEM (Transmission Electron Microscopy) images. The determined density of these threading dislocations was of the order of 9×10 9 cm -2. The sheet resistances of the GaN layers were measured. The average sheet resistance significantly increases from 2867 Ω sq -1 for sample A (without nitridation) to 8124 Ω sq -1 for sample F (with 660 s nitridation). The photoluminescence (PL) measurements of the samples nitridated at various nitridation times were done at a temperature range of 10-300 K. A strong band edge PL emission line, which was centered at approx. 3.453 eV along with its phonon replicas which was separated by approx. 92 meV in successive orders, was observed at 10 K. The full width at half maximum (FWHM) of this peak is approx. 14 meV, which indicates the reasonable optical quality of the GaN epilayers grown on Si substrate. At room temperature, the peak position and FWHM of this emission became 3.396 eV and 58 meV, respectively.

  19. Very low temperature (450 °C) selective epitaxial growth of heavily in situ boron-doped SiGe layers

    NASA Astrophysics Data System (ADS)

    Aubin, J.; Hartmann, J. M.; Veillerot, M.; Essa, Z.; Sermage, B.

    2015-11-01

    We have investigated the feasibility of selectively growing SiGe:B layers at 450 °C, 20 Torr in a 300 mm industrial reduced pressure chemical vapor deposition tool. A reduced H2 carrier gas mass-flow has been used in order to have acceptable growth rates at such a temperature, which is very low indeed. We have first of all studied on blanket Si wafers the in situ boron doping of SiGe with Si2H6, GeH4 and B2H6. A growth rate increase by a factor close to 7 together with a Ge concentration decrease from 53% down to 32% occurred as the diborane mass-flow increased. Very high B+ ion concentrations were obtained in layers that were single crystalline and smooth. Their concentration increased almost linearly with the B2H6 mass-flow, from 1.8 up to 8.3 × 1020 cm-3. The associated resistivity dropped from 0.43 down to 0.26 mΩ cm. We have then tested whether or not selectivity versus SiO2 could be achieved by adding various amounts of HCl to Si2H6 + GeH4 +B2H6. Single crystalline growth rates of intrinsic SiGe(:B) on Si were very similar to poly-crystalline growth rates on SiO2-covered substrates irrespective of the HCl flow. Straightforward selectivity was thus not feasible with a co-flow approach. As a consequence, a 450 °C deposition/etch (DE) process was evaluated. Growth occurred at 20 Torr with the above-mentioned chemistry, while the selective etch of poly-SiGe:B versus c-SiGe:B was conducted at 740 Torr with a medium HCl mass-flow (F(HCl)/F(H2) = 0.2) and a high H2 flow. A 2.2 etch selectivity was achieved while retaining single crystalline if slightly rough SiGe:B layers.

  20. Semibulk InGaN: A novel approach for thick, single phase, epitaxial InGaN layers grown by MOVPE

    NASA Astrophysics Data System (ADS)

    Pantzas, K.; El Gmili, Y.; Dickerson, J.; Gautier, S.; Largeau, L.; Mauguin, O.; Patriarche, G.; Suresh, S.; Moudakir, T.; Bishop, C.; Ahaitouf, A.; Rivera, T.; Tanguy, C.; Voss, P. L.; Ougazzaden, A.

    2013-05-01

    In this paper we demonstrate a solution to systematically obtain thick, single phase InGaN epilayers by MOVPE. The solution consists in periodically inserting ultra-thin GaN interlayers during InGaN growth. Measurements by HAADF-STEM, X-ray diffraction, cathodoluminescence and photoluminescence demonstrate the effective suppression of the three-dimensional sublayer that is shown to spontaneously form in control InGaN epilayers grown without this method. Simulation predicts that tunneling through the GaN barriers is efficient and that carrier transport through this semi-bulk InGaN/GaN structure is similar to that of bulk InGaN. Such structures may be useful for improving the efficiency of InGaN solar cells by allowing thicker, higher quality InGaN absorption layers.

  1. Photoluminescence between 3.36 eV and 3.41 eV from GaN epitaxial layers

    SciTech Connect

    Seitz, R.; Gaspar, C.; Monteiro, T.; Pereira, E.; Poisson, M.A.; Beaumont, B.

    1999-07-01

    GaN, its alloys, QWs and MQWs have gained an important place among short-wavelength optical emitters and high temperature electronic devices. The performance of such devices is limited by the presence of native and impurity defects. The understanding of the optical properties of the basic material allows them to improve its quality and thus increase the performance of these materials. In non intentionally doped (nid) hexagonal good quality GaN layers grown on sapphire, 6H-SiC or Si, free exciton (FXC, FXB, FXA), donor bound exciton (DX), acceptor bound exciton (AX) and donor-acceptor pair (DAP) transitions have been reported by several authors. Besides these typical emissions, emission lines in the range 3.3--3.44 eV have been observed in nid and intentionally doped hexagonal GaN layers. However, the nature of these recombinations is not completely clarified. Some authors assigned them to a superposition of LO phonon assisted transitions of DX and FX, excitons bound to neutral donors with deeper donor levels, band to impurity transitions and/or free to bound emission involving oxygen, DAP transitions, shallow bound excitons of cubic phases, excitons bound to structural defects and Zn related recombinations. In this work the authors analyze the luminescence between 3.36 eV and 3.41 eV of nid hexagonal GaN samples grown on sapphire. They found sample dependent emission lines with no DAP behavior. From the data they are able to identify different kinds of recombination processes in the same spectral region.

  2. Epitaxial growth of fcc Cr on Au(100)

    SciTech Connect

    Durbin, S.M.; Berman, L.E.; Batterman, B.W.; Brodsky, M.B.; Hamaker, H.C.

    1988-04-15

    Synchrotron x-ray diffraction and anomalous dispersion measurements of 25A Cr layers epitaxially grown on (100) Au surfaces indicate the presence of fcc Cr domains, while extended x-ray absorption fine-structure spectra are consistent with the usual bcc phase of Cr. Together these data suggest that the fcc phase is a major fraction of the larger epitaxial Cr domains, but that most Cr atoms are in a bcc environment with much smaller domain sizes. This unusual, epitaxially stabilized fcc Cr structure may be related to previously reported low-temperature resistance anomalies.

  3. Point defect balance in epitaxial GaSb

    SciTech Connect

    Segercrantz, N. Slotte, J.; Makkonen, I.; Kujala, J.; Tuomisto, F.; Song, Y.; Wang, S.

    2014-08-25

    Positron annihilation spectroscopy in both conventional and coincidence Doppler broadening mode is used for studying the effect of growth conditions on the point defect balance in GaSb:Bi epitaxial layers grown by molecular beam epitaxy. Positron annihilation characteristics in GaSb are also calculated using density functional theory and compared to experimental results. We conclude that while the main positron trapping defect in bulk samples is the Ga antisite, the Ga vacancy is the most prominent trap in the samples grown by molecular beam epitaxy. The results suggest that the p–type conductivity is caused by different defects in GaSb grown with different methods.

  4. Process for depositing an oxide epitaxially onto a silicon substrate and structures prepared with the process

    DOEpatents

    McKee, Rodney A.; Walker, Frederick J.

    1993-01-01

    A process and structure involving a silicon substrate utilizes an ultra high vacuum and molecular beam epitaxy (MBE) methods to grow an epitaxial oxide film upon a surface of the substrate. As the film is grown, the lattice of the compound formed at the silicon interface becomes stabilized, and a base layer comprised of an oxide having a sodium chloride-type lattice structure grows epitaxially upon the compound so as to cover the substrate surface. A perovskite may then be grown epitaxially upon the base layer to render a product which incorporates silicon, with its electronic capabilities, with a perovskite having technologically-significant properties of its own.

  5. Growth of epitaxial thin films by pulsed laser ablation

    SciTech Connect

    Lowndes, D.H.

    1992-01-01

    High-quality, high-temperature superconductor (HTSc) films can be grown by the pulsed laser ablation (PLA) process. This article provides a detailed introduction to the advantages and curent limitations of PLA for epitaxial film growth. Emphasis is placed on experimental methods and on exploitation of PLA to control epitaxial growth at either the unit cell or the atomic-layer level. Examples are taken from recent HTSc film growth. 33 figs, 127 refs. (DLC)

  6. Growth of epitaxial thin films by pulsed laser ablation

    SciTech Connect

    Lowndes, D.H.

    1992-10-01

    High-quality, high-temperature superconductor (HTSc) films can be grown by the pulsed laser ablation (PLA) process. This article provides a detailed introduction to the advantages and curent limitations of PLA for epitaxial film growth. Emphasis is placed on experimental methods and on exploitation of PLA to control epitaxial growth at either the unit cell or the atomic-layer level. Examples are taken from recent HTSc film growth. 33 figs, 127 refs. (DLC)

  7. Effect of Z1/2, EH5, and Ci1 deep defects on the performance of n-type 4H-SiC epitaxial layers Schottky detectors: Alpha spectroscopy and deep level transient spectroscopy studies

    NASA Astrophysics Data System (ADS)

    Mannan, Mohammad A.; Chaudhuri, Sandeep K.; Nguyen, Khai V.; Mandal, Krishna C.

    2014-06-01

    Spectroscopic performance of Schottky barrier alpha particle detectors fabricated on 50 μm thick n-type 4H-SiC epitaxial layers containing Z1/2, EH5, and Ci1 deep levels were investigated. The device performance was evaluated on the basis of junction current/capacitance characterization and alpha pulse-height spectroscopy. Capacitance mode deep level transient spectroscopy revealed the presence of the above-mentioned deep levels along with two shallow level defects related to titanium impurities (Ti(h) and Ti(c)) and an unidentified deep electron trap located at 2.4 eV below the conduction band minimum, which is being reported for the first time. The concentration of the lifetime killer Z1/2 defects was found to be 1.7 × 1013 cm-3. The charge transport and collection efficiency results obtained from the alpha particle pulse-height spectroscopy were interpreted using a drift-diffusion charge transport model. Based on these investigations, the physics behind the correlation of the detector properties viz., energy resolution and charge collection efficiency, the junction properties like uniformity in barrier-height, leakage current, and effective doping concentration, and the presence of defects has been discussed in details. The studies also revealed that the dominating contribution to the charge collection efficiency was due to the diffusion of charge carriers generated in the neutral region of the detector. The 10 mm2 large area detectors demonstrated an impressive energy resolution of 1.8% for 5486 keV alpha particles at an optimized operating reverse bias of 130 V.

  8. Process for growing epitaxial gallium nitride and composite wafers

    DOEpatents

    Weber, Eicke R.; Subramanya, Sudhir G.; Kim, Yihwan; Kruger, Joachim

    2003-05-13

    A novel growth procedure to grow epitaxial Group III metal nitride thin films on lattice-mismatched substrates is proposed. Demonstrated are the quality improvement of epitaxial GaN layers using a pure metallic Ga buffer layer on c-plane sapphire substrate. X-ray rocking curve results indicate that the layers had excellent structural properties. The electron Hall mobility increases to an outstandingly high value of .mu.>400 cm.sup.2 /Vs for an electron background concentration of 4.times.10.sup.17 cm.sup.-3.

  9. An epitaxial ferroelectric tunnel junction on silicon.

    PubMed

    Li, Zhipeng; Guo, Xiao; Lu, Hui-Bin; Zhang, Zaoli; Song, Dongsheng; Cheng, Shaobo; Bosman, Michel; Zhu, Jing; Dong, Zhili; Zhu, Weiguang

    2014-11-12

    Epitaxially grown functional perovskites on silicon (001) and the ferroelectricity of a 3.2 nm thick BaTiO3 barrier layer are demonstrated. The polarization-switching-induced change in tunneling resistance is measured to be two orders of magnitude. The obtained results suggest the possibility of integrating ferroelectric tunnel junctions as binary data storage media in non-volatile memory cells on a silicon platform. PMID:25200550

  10. High throughput vacuum chemical epitaxy

    NASA Astrophysics Data System (ADS)

    Fraas, L. M.; Malocsay, E.; Sundaram, V.; Baird, R. W.; Mao, B. Y.; Lee, G. Y.

    1990-10-01

    We have developed a vacuum chemical epitaxy (VCE) reactor which avoids the use of arsine and allows multiple wafers to be coated at one time. Our vacuum chemical epitaxy reactor closely resembles a molecular beam epitaxy system in that wafers are loaded into a stainless steel vacuum chamber through a load chamber. Also as in MBE, arsenic vapors are supplied as reactant by heating solid arsenic sources thereby avoiding the use of arsine. However, in our VCE reactor, a large number of wafers are coated at one time in a vacuum system by the substitution of Group III alkyl sources for the elemental metal sources traditionally used in MBE. Higher wafer throughput results because in VCE, the metal-alkyl sources for Ga, Al, and dopants can be mixed at room temperature and distributed uniformly though a large area injector to multiple substrates as a homogeneous array of mixed element molecular beams. The VCE reactor that we have built and that we shall describe here uniformly deposits films on 7 inch diameter substrate platters. Each platter contains seven two inch or three 3 inch diameter wafers. The load chamber contains up to nine platters. The vacuum chamber is equipped with two VCE growth zones and two arsenic ovens, one per growth zone. Finally, each oven has a 1 kg arsenic capacity. As of this writing, mirror smooth GaAs films have been grown at up to 4 μm/h growth rate on multiple wafers with good thickness uniformity. The background doping is p-type with a typical hole concentration and mobility of 1 × 10 16/cm 3 and 350 cm 2/V·s. This background doping level is low enough for the fabrication of MESFETs, solar cells, and photocathodes as well as other types of devices. We have fabricated MESFET devices using VCE-grown epi wafers with peak extrinsic transconductance as high as 210 mS/mm for a threshold voltage of - 3 V and a 0.6 μm gate length. We have also recently grown AlGaAs epi layers with up to 80% aluminum using TEAl as the aluminum alkyl source. The Al

  11. Optical properties of epitaxial YAG:Yb films

    NASA Astrophysics Data System (ADS)

    Ubizskii, S. B.; Matkovskii, A. O.; Melnyk, S. S.; Syvorotka, I. M.; Müller, V.; Peters, V.; Petermann, K.; Beyertt, A.; Giesen, A.

    2004-03-01

    This work deals with the investigation of the optical properties of epitaxial YAG:Yb films and their suitability as gain media for thin disk lasers. Epitaxial films of YAG:Yb were grown by the liquid phase epitaxy method in air on the (111)-oriented YAG substrates. The thickness of the grown layers was from 30 to 260 m. The melt composition was varied to obtain the desired doping level from 10 to 15% and to optimize the optical properties. The best epitaxial films were colourless and had an Yb3+ luminescence lifetime of more than 950 s, which is very close to the intrinsic lifetime of the Yb ions in the bulk YAG single crystals. These films were tested in a thin disk laser setup with 24 absorption passes of the 940 nm pumping beam. The maximum output power at 1.03 m wavelength in CW operation reached more than 60 W and the optical efficiency was close to 30%.

  12. Coincident-site lattice matching during van der Waals epitaxy

    PubMed Central

    Boschker, Jos E.; Galves, Lauren A.; Flissikowski, Timur; Lopes, Joao Marcelo J.; Riechert, Henning; Calarco, Raffaella

    2015-01-01

    Van der Waals (vdW) epitaxy is an attractive method for the fabrication of vdW heterostructures. Here Sb2Te3 films grown on three different kind of graphene substrates (monolayer epitaxial graphene, quasi freestanding bilayer graphene and the SiC (6√3 × 6√3)R30° buffer layer) are used to study the vdW epitaxy between two 2-dimensionally (2D) bonded materials. It is shown that the Sb2Te3 /graphene interface is stable and that coincidence lattices are formed between the epilayers and substrate that depend on the size of the surface unit cell. This demonstrates that there is a significant, although relatively weak, interfacial interaction between the two materials. Lattice matching is thus relevant for vdW epitaxy with two 2D bonded materials and a fundamental design parameter for vdW heterostructures. PMID:26658715

  13. Low-temperature plasma-deposited silicon epitaxial films: Growth and properties

    SciTech Connect

    Demaurex, Bénédicte Bartlome, Richard; Seif, Johannes P.; Geissbühler, Jonas; Ballif, Christophe; De Wolf, Stefaan; Alexander, Duncan T. L.; Jeangros, Quentin

    2014-08-07

    Low-temperature (≤200 °C) epitaxial growth yields precise thickness, doping, and thermal-budget control, which enables advanced-design semiconductor devices. In this paper, we use plasma-enhanced chemical vapor deposition to grow homo-epitaxial layers and study the different growth modes on crystalline silicon substrates. In particular, we determine the conditions leading to epitaxial growth in light of a model that depends only on the silane concentration in the plasma and the mean free path length of surface adatoms. For such growth, we show that the presence of a persistent defective interface layer between the crystalline silicon substrate and the epitaxial layer stems not only from the growth conditions but also from unintentional contamination of the reactor. Based on our findings, we determine the plasma conditions to grow high-quality bulk epitaxial films and propose a two-step growth process to obtain device-grade material.

  14. Low-temperature plasma-deposited silicon epitaxial films: Growth and properties

    SciTech Connect

    Demaurex, Bénédicte; Bartlome, Richard; Seif, Johannes P.; Geissbühler, Jonas; Alexander, Duncan T. L.; Jeangros, Quentin; Ballif, Christophe; De Wolf, Stefaan

    2014-08-05

    Low-temperature (≤ 180 °C) epitaxial growth yields precise thickness, doping, and thermal-budget control, which enables advanced-design semiconductor devices. In this paper, we use plasma-ehanced chemical vapor deposition to grow homo-epitaxial layers and study the different growth modes on crystalline silicon substrates. In particular, we determine the conditions leading to epitaxial growth in light of a model that depends only on the silane concentration in the plasma and the mean free path length of surface adatoms. For such growth, we show that the presence of a persistent defective interface layer between the crystalline silicon substrate and the epitaxial layer stems not only from the growth conditions but also from unintentional contamination of the reactor. As a result of our findings, we determine the plasma conditions to grow high-quality bulk epitaxial films and propose a two-step growth process to obtain device-grade material.

  15. Large area epitaxial germanane for electronic devices

    NASA Astrophysics Data System (ADS)

    Amamou, Walid; Odenthal, Patrick M.; Bushong, Elizabeth J.; O'Hara, Dante J.; Luo, Yunqiu Kelly; van Baren, Jeremiah; Pinchuk, Igor; Wu, Yi; Ahmed, Adam S.; Katoch, Jyoti; Bockrath, Marc W.; Tom, Harry W. K.; Goldberger, Joshua E.; Kawakami, Roland K.

    2015-09-01

    We report the synthesis and transfer of epitaxial germanane (GeH) onto arbitrary substrates by electrochemical delamination and investigate its optoelectronic properties. GeH films with thickness ranging from 1 to 600 nm (2-1000 layers) and areas up to ˜1 cm2 have been reliably transferred and characterized by photoluminescence, x-ray diffraction, and energy-dispersive x-ray spectroscopy. Wavelength dependent photoconductivity measurements on few-layer GeH exhibit an absorption edge and provide a sensitive characterization tool for ultrathin germanane materials. The transfer process also enables the possibility of integrating germanane into vertically stacked heterostructures.

  16. Perspective: Oxide molecular-beam epitaxy rocks!

    SciTech Connect

    Schlom, Darrell G.

    2015-06-01

    Molecular-beam epitaxy (MBE) is the “gold standard” synthesis technique for preparing semiconductor heterostructures with high purity, high mobility, and exquisite control of layer thickness at the atomic-layer level. Its use for the growth of multicomponent oxides got off to a rocky start 30 yr ago, but in the ensuing decades, it has become the definitive method for the preparation of oxide heterostructures too, particularly when it is desired to explore their intrinsic properties. Examples illustrating the unparalleled achievements of oxide MBE are given; these motivate its expanding use for exploring the potentially revolutionary states of matter possessed by oxide systems.

  17. Perspective: Oxide molecular-beam epitaxy rocks!

    NASA Astrophysics Data System (ADS)

    Schlom, Darrell G.

    2015-06-01

    Molecular-beam epitaxy (MBE) is the "gold standard" synthesis technique for preparing semiconductor heterostructures with high purity, high mobility, and exquisite control of layer thickness at the atomic-layer level. Its use for the growth of multicomponent oxides got off to a rocky start 30 yr ago, but in the ensuing decades, it has become the definitive method for the preparation of oxide heterostructures too, particularly when it is desired to explore their intrinsic properties. Examples illustrating the unparalleled achievements of oxide MBE are given; these motivate its expanding use for exploring the potentially revolutionary states of matter possessed by oxide systems.

  18. Dislocations limited electronic transport in hydride vapour phase epitaxy grown GaN templates: A word of caution for the epitaxial growers

    SciTech Connect

    Chatterjee, Abhishek Khamari, Shailesh K.; Kumar, R.; Dixit, V. K.; Oak, S. M.; Sharma, T. K.

    2015-01-12

    GaN templates grown by hydride vapour phase epitaxy (HVPE) and metal organic vapour phase epitaxy (MOVPE) techniques are compared through electronic transport measurements. Carrier concentration measured by Hall technique is about two orders larger than the values estimated by capacitance voltage method for HVPE templates. It is learnt that there exists a critical thickness of HVPE templates below which the transport properties of epitaxial layers grown on top of them are going to be severely limited by the density of charged dislocations lying at layer-substrate interface. On the contrary MOVPE grown templates are found to be free from such limitations.

  19. Nature and origin of V-defects present in metalorganic vapor phase epitaxy-grown (InxAl1-x)N layers as a function of InN content, layer thickness and growth parameters

    NASA Astrophysics Data System (ADS)

    Vennéguès, P.; Diaby, B. S.; Kim-Chauveau, H.; Bodiou, L.; Schenk, H. P. D.; Frayssinet, E.; Martin, R. W.; Watson, I. M.

    2012-08-01

    Our study of samples grown in different metalorganic chemical vapor deposition reactors and with different growth conditions reveals that V-pits are always present in (InxAl1-x)N films whatever the layer thickness and the InN content. V-pits are empty inverted pyramids terminating threading dislocations. InN-rich triangular regions are present around the threading dislocations terminated by pits with a hexagonal 6-fold symmetry distribution in {11-20} planes. The nature of the facets of the V-pits depends on the growth conditions: pits with either {11-2l}, l being between 1 and 3, or {1-101} facets have been observed. Moreover, the nature of the threading dislocations terminated by pits also depends on the growth conditions. Our observations suggest that with a high V/III ratio only edge a+c-type dislocations are terminated by pits whereas with a low V/III ratio both edge a-type and mixed a+c-type dislocations are terminated by pits.

  20. In-situ epitaxial growth of graphene/h-BN van der Waals heterostructures by molecular beam epitaxy

    PubMed Central

    Zuo, Zheng; Xu, Zhongguang; Zheng, Renjing; Khanaki, Alireza; Zheng, Jian-Guo; Liu, Jianlin

    2015-01-01

    Van der Waals materials have received a great deal of attention for their exceptional layered structures and exotic properties, which can open up various device applications in nanoelectronics. However, in situ epitaxial growth of dissimilar van der Waals materials remains challenging. Here we demonstrate a solution for fabricating van der Waals heterostructures. Graphene/hexagonal boron nitride (h-BN) heterostructures were synthesized on cobalt substrates by using molecular beam epitaxy. Various characterizations were carried out to evaluate the heterostructures. Wafer-scale heterostructures consisting of single-layer/bilayer graphene and multilayer h-BN were achieved. The mismatch angle between graphene and h-BN is below 1°. PMID:26442629

  1. Wafer bonded epitaxial templates for silicon heterostructures

    NASA Technical Reports Server (NTRS)

    Atwater, Harry A., Jr. (Inventor); Zahler, James M. (Inventor); Morral, Anna Fontcubera I (Inventor)

    2008-01-01

    A heterostructure device layer is epitaxially grown on a virtual substrate, such as an InP/InGaAs/InP double heterostructure. A device substrate and a handle substrate form the virtual substrate. The device substrate is bonded to the handle substrate and is composed of a material suitable for fabrication of optoelectronic devices. The handle substrate is composed of a material suitable for providing mechanical support. The mechanical strength of the device and handle substrates is improved and the device substrate is thinned to leave a single-crystal film on the virtual substrate such as by exfoliation of a device film from the device substrate. An upper portion of the device film exfoliated from the device substrate is removed to provide a smoother and less defect prone surface for an optoelectronic device. A heterostructure is epitaxially grown on the smoothed surface in which an optoelectronic device may be fabricated.

  2. Development of epitaxial growth technology for Ge1-xSnx alloy and study of its properties for Ge nanoelectronics

    NASA Astrophysics Data System (ADS)

    Nakatsuka, Osamu; Shimura, Yosuke; Takeuchi, Wakana; Taoka, Noriyuki; Zaima, Shigeaki

    2013-05-01

    We have recently developed an epitaxial growth technique for Ge1-xSnx layers with an especially high Sn content, and we investigated the crystalline properties of the Ge1-xSnx epitaxial layers. In this report, we describe our recent achievements for improving the crystalline quality of the epitaxial growth of Ge1-xSnx layers on various substrates. We also demonstrate the impacts of Sn incorporation on the defect and dopant behaviors and electrical properties of Ge1-xSnx epitaxial layers. Sn incorporation improves on the issue of unintentional hole generation due to vacancy defects and enhances the dopant activation of Ga atoms in the Ge matrix. In addition, we introduce a recent study of the optical properties of Ge1-xSnx epitaxial layers with very high Sn contents.

  3. Spatially Correlated Disorder in Epitaxial van der Waals Heterostructures

    NASA Astrophysics Data System (ADS)

    Laanait, Nouamane; Zhang, Zhan; Schleputz, Christian; Liu, Ying; Wojcik, Michael; Myers-Ward, Rachael; Gaskill, D. Kurt; Fenter, Paul; Li, Lian

    The structural cohesion of van der Waals (vdW) heterostructures relies upon a cooperative balance between strong intra-layer bonded interactions and weak inter-layer coupling. The confinement of extended defects to within a single vdW layer and competing interactions introduced by epitaxial constraints could generate fundamentally new structural disorders. Here we report on the presence of spatially correlated and localized disorder states that coexist with the near perfect crystallographic order along the growth direction of epitaxial vdW heterostructure of Bi2Se3/graphene/SiC grown by molecular beam epitaxy. With the depth penetration of hard X-ray diffraction microscopy and high-resolution surface scattering, we imaged local structural configurations from the atomic to mesoscopic length scales, and found that these disorder states result as a confluence of atomic scale modulations in the strength of vdW layer-layer interactions and nanoscale boundary conditions imposed by the substrate. These findings reveal a vast landscape of novel disorder states that can be manifested in epitaxial vdW heterostructures. Supported by the Wigner Fellowship program at Oak Ridge Nat'l Lab.

  4. Vacancies in epitaxial graphene

    SciTech Connect

    Davydov, S. Yu.

    2015-08-15

    The coherent-potential method is used to consider the problem of the influence of a finite concentration of randomly arranged vacancies on the density of states of epitaxial graphene. To describe the density of states of the substrate, simple models (the Anderson model, Haldane-Anderson model, and parabolic model) are used. The electronic spectrum of free single-sheet graphene is considered in the low-energy approximation. Charge transfer in the graphene-substrate system is discussed. It is shown that, in all cases, the density of states of epitaxial graphene decreases proportionally to the vacancy concentration. At the same time, the average charge transferred from graphene to the substrate increases.

  5. Germanium epitaxy on silicon

    NASA Astrophysics Data System (ADS)

    Ye, Hui; Yu, Jinzhong

    2014-04-01

    With the rapid development of on-chip optical interconnects and optical computing in the past decade, silicon-based integrated devices for monolithic and hybrid optoelectronic integration have attracted wide attention. Due to its narrow pseudo-direct gap behavior and compatibility with Si technology, epitaxial Ge-on-Si has become a significant material for optoelectronic device applications. In this paper, we describe recent research progress on heteroepitaxy of Ge flat films and self-assembled Ge quantum dots on Si. For film growth, methods of strain modification and lattice mismatch relief are summarized, while for dot growth, key process parameters and their effects on the dot density, dot morphology and dot position are reviewed. The results indicate that epitaxial Ge-on-Si materials will play a bigger role in silicon photonics.

  6. Growth of Defect-Free 3C-Sic on 4H- and 6H-SIC Mesas Using Step-Free Surface Heteroepitaxy

    NASA Technical Reports Server (NTRS)

    Neudeck, Philip G.; Powell, J. Anthony; Trunek, Andrew J.; Huang, Xianrong R.; Dudley, Michael

    2002-01-01

    A new growth process, herein named step-free surface heteroepitaxy, has achieved 3C-SiC films completely free of double positioning boundaries and stacking faults on 4H-SiC and 6H-SiC substrate mesas. The process is based upon the initial 2-dimensional nucleation and lateral expansion of a single island of 3C-SiC on a 4H- or 6H-SiC mesa surface that is completely free of bilayer surface steps. Our experimental results indicate that substrate-epilayer in-plane lattice mismatch (Delta/a = 0.0854% for 3C/4H) is at least partially relieved parallel to the interface in the initial bilayers of the heterofilm, producing an at least partially relaxed 3C-SiC film without dislocations that undesirably thread through the thickness of the epilayer. This result should enable realization of improved 3C-SiC devices.

  7. The role of vapour etching in the growth of epitaxial InP

    NASA Astrophysics Data System (ADS)

    Ashen, D. J.; Anderson, D. A.; Apsley, N.; Emeny, M. T.

    1982-12-01

    Undoped single epitaxial layers of InP have been grown by the In-PCI 3-H 2 technique. Hall data, carrier concentration profile and layer surface quality have been studied as a function of pre-growth vapour etching and source saturation conditions. Incomplete vapour etching is shown to lead to layers with low room temperature mobility, large carrier freeze-out between 290 and 77 K, and a large density of defects on the epitaxial layer surface. Carrier concentration profiles through such layers show evidence of a high conductivity region at the interface with the substrate which we suggest is formed by material grown during source saturation. We demonstrate that the growth of high carrier concentration material can take place from an unsaturated source, and we show that a two-layer model accounts quantitatively for the Hall data. These results can be used to specify the appropriate etching conditions to grow epitaxial layers with abrupt interfaces and high mobility.

  8. Growth of Low-Resistivity n-Type ZnTe by Metalorganic Vapor Phase Epitaxy

    NASA Astrophysics Data System (ADS)

    Ogawa, Hiroshi; Irfan, Gheyas; Nakayama, Hitoshi; Nishio, Mitsuhiro; Yoshida, Akira

    1994-07-01

    Doping of ZnTe has been carried out by metalorganic vapor phase epitaxy using triethylaluminum as the dopant source. N-type ZnTe layers with a carrier concentration of (1 4) ×1017 cm-3 and a resistivity as low as 0.1 0.3 Ω·cm have been obtained. It has been indicated by the photoluminescence measurement that Al is incorporated effectively into the epitaxial layer.

  9. Epitaxial piezoelectric thick film heterostructures on silicon

    NASA Astrophysics Data System (ADS)

    Kim, Dong Min

    The significantly higher dielectric permittivity, piezoelectric coefficients and electromechanical coupling coefficients of single crystal relaxor ferroelectrics make them very attractive for medical ultrasound transducers and microelectromechanical systems (MEMS) applications. The potential impact of thin-film relaxor ferroelectrics in integrated actuators and sensor on silicon has stimulated research on the growth and characterization of epitaxial piezoelectric thin films. We have fabricated heterostructures by (1) synthesizing optimally-oriented, epitaxial thin films of Pb(Mg1/3Nb2/3)O3-PbTiO 3 (PMN-PT) on miscut (001) Si wafers with epitaxial (001) SrTiO 3 template layers, where the single crystal form is known to have the giant piezoelectric response, and (2) nano-structuring to reduce the constraint imposed by the underlying silicon substrate. Up to now, the longitudinal piezoelectric coefficient (d33) values of PMN and PMN-PT thin films range from 50 to 200 pC/N have been reported, which are far inferior to the properties of bulk single crystals value (d33 ˜ 2000 pC/N). These might be attributed to substrate constraints, pyrochlore phases and other effects. Here, we have realized the giant d33 values by fabricating epitaxial PMN-PT thick films on silicon. When the PMN-PT film was subdivided into ˜1 mum2 capacitors by focused ion beam processing, a 4 mum thick film shows a low-field d33 of 800 pm/V that increases to over 1200 pm/V under bias, which is the highest d33 value ever realized on silicon substrates. These high piezo-reponse PMN-PT epitaxial heterostructures can be used for multilayered MEMS devices which function with low driving voltage, high frequency ultrasound transducer arrays for medical imaging, and capacitors for charge and energy storage. Since these PMN-PT films are epitaxially integrated with the silicon, they can make use of the well-developed fabrication process for patterning and micromachining of this large-area, cost

  10. Improved epitaxial process for fabricating silicon carbide semiconductor devices

    NASA Technical Reports Server (NTRS)

    Will, H. A.; Powell, J. A.

    1974-01-01

    Process of growing expitaxial silicon carbide (SiC) layers on SiC substrates so that epitaxial growth is perpendicular to c-axis by chemical vapor deposition process at temperatures of 1590 to 1660 K minimizes variations in stacking sequence and problems associated with high temperatures.

  11. Structural study and ferroelectricity of epitaxial BaTiO3 films on silicon grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Mazet, L.; Bachelet, R.; Louahadj, L.; Albertini, D.; Gautier, B.; Cours, R.; Schamm-Chardon, S.; Saint-Girons, G.; Dubourdieu, C.

    2014-12-01

    Integration of epitaxial complex ferroelectric oxides such as BaTiO3 on semiconductor substrates depends on the ability to finely control their structure and properties, which are strongly correlated. The epitaxial growth of thin BaTiO3 films with high interfacial quality still remains scarcely investigated on semiconductors; a systematic investigation of processing conditions is missing although they determine the cationic composition, the oxygen content, and the microstructure, which, in turn, play a major role on the ferroelectric properties. We report here the study of various relevant deposition parameters in molecular beam epitaxy for the growth of epitaxial tetragonal BaTiO3 thin films on silicon substrates. The films were grown using a 4 nm-thick epitaxial SrTiO3 buffer layer. We show that the tetragonality of the BaTiO3 films, the crystalline domain orientations, and SiO2 interfacial layer regrowth strongly depend on the oxygen partial pressure and temperature during the growth and on the post-deposition anneal. The ferroelectricity of the films, probed using piezoresponse force microscopy, is obtained in controlled temperature and oxygen pressure conditions with a polarization perpendicular to the surface.

  12. Hetero epitaxial graphene on various substrates

    NASA Astrophysics Data System (ADS)

    Harris, Gary; Kaut, Gurpreet; Taylor, Crawford

    2015-03-01

    Large-scale production of graphene is pivotal for the development of graphene-based electronics. These results focus on the synthesis and characterization of graphene layers. Two methods were used to grow graphene films. First, graphene films were epitaxially grown on silicon carbide substrates by thermal decomposition of SiC at high temperature and low pressure. In-house built reactor consisting of induction furnace was used to form epitaxial films for electronic applications. Second, chemical vapor deposition method was used for direct graphene synthesis on 3C-SiC with the use of copper as a catalyst. In thermal CVD process, hydrogen and methane gases were used as precursors. Methane acts as a carbon source and annealing and cooling were done hydrogen environment. Different polytypes of silicon carbide (6H-SiC and 3C-SiC) and their crystal orientations were exploited as substrates to form epitaxial graphene. Hetero epitaxial 3C-SiC epilayer was first deposited on Si substrate using chemical vapor deposition technique in cold wall, low pressure, and horizontal CVD reactor. The reactor temperature, argon pressure, flow rates and concentration of different gases (propane, silane, hydrogen and argon) was investigated to control the growth of 3C-SiC and silicon sublimation rate. The resulting graphene films were confirmed using Raman spectroscopy. Further, graphene films have been characterized with the tools of atomic force microscopy (AFM) and scanning electron microscopy (SEM). Mobility, electrical resistivity and carrier density measurements were taken using hall measurements. NSF_PRDM

  13. Methods of preparing flexible photovoltaic devices using epitaxial liftoff, and preserving the integrity of growth substrates used in epitaxial growth

    DOEpatents

    Forrest, Stephen R; Zimmerman, Jeramy; Lee, Kyusang; Shiu, Kuen-Ting

    2013-02-19

    There is disclosed methods of making photosensitive devices, such as flexible photovoltaic (PV) devices, through the use of epitaxial liftoff. Also described herein are methods of preparing flexible PV devices comprising a structure having a growth substrate, wherein the selective etching of protective layers yields a smooth growth substrate that us suitable for reuse.

  14. Methods of preparing flexible photovoltaic devices using epitaxial liftoff, and preserving the integrity of growth substrates used in epitaxial growth

    DOEpatents

    Forrest, Stephen R; Zimmerman, Jeramy; Lee, Kyusang; Shiu, Kuen-Ting

    2015-01-06

    There is disclosed methods of making photosensitive devices, such as flexible photovoltaic (PV) devices, through the use of epitaxial liftoff. Also described herein are methods of preparing flexible PV devices comprising a structure having a growth substrate, wherein the selective etching of protective layers yields a smooth growth substrate that us suitable for reuse.

  15. Optical Probing of metamagnetic phases in epitaxial EuSe

    SciTech Connect

    Galgano, G. D.; Henriques, A. B.; Bauer, G.; Springholz, G.

    2011-12-23

    EuSe is a wide gap magnetic semiconductors with a potential for applications in proof-of-concept spintronic devices. When the temperature is lowered, EuSe goes through sharp transitions between a variety of magnetic phases and is thus described as metamagnetic. The purpose of the present investigation is to correlate the magnetic order to the sharp dichroic doublet, discovered recently in high quality thin epitaxial layers of EuSe, grown by molecular beam epitaxy. We report detailed measurements of the doublet positions and intensities as a function of magnetic field in low temperatures, covering several magnetic phases.

  16. Au-free epitaxial growth of InAs nanowires.

    PubMed

    Mandl, Bernhard; Stangl, Julian; Mårtensson, Thomas; Mikkelsen, Anders; Eriksson, Jessica; Karlsson, Lisa S; Bauer, G Uuml Nther; Samuelson, Lars; Seifert, Werner

    2006-08-01

    III-V nanowires have been fabricated by metal-organic vapor-phase epitaxy without using Au or other metal particles as a catalyst. Instead, prior to growth, a thin SiOx layer is deposited on the substrates. Wires form on various III-V substrates as well as on Si. They are nontapered in thickness and exhibit a hexagonal cross-section. From high-resolution X-ray diffraction, the epitaxial relation between wires and substrates is demonstrated and their crystal structure is determined. PMID:16895379

  17. Engineering epitaxial graphene with oxygen

    NASA Astrophysics Data System (ADS)

    Kimouche, Amina; Martin, Sylvain; Winkelmann, Clemens; Fruchart, Olivier; Courtois, Hervé; Coraux, Johann; Hybrid system at low dimension Team

    2013-03-01

    Almost free-standing graphene can be obtained on metals by decoupling graphene from its substrate, for instance by intercalation of atoms beneath graphene, as it was shown with oxygen atoms. We show that the interaction of oxygen with epitaxial graphene on iridium leads to the formation of an ultrathin crystalline oxide extending between graphene and the metallic substrate via the graphene wrinkles. Graphene studied in this work was prepared under ultra-high vacuum by CVD. The samples were studied by combining scanning probe microscopy (STM, AFM) and spatially resolved spectroscopy (Raman, STS). The ultrathin oxide forms a decoupling barrier layer between graphene and Ir, yielding truly free-standing graphene whose hybridization and charge transfers with the substrate have been quenched. Our work presents novel types of graphene-based nanostructures, and opens the route to the transfer-free preparation of graphene directly onto an insulating support contacted to the metallic substrate which could serve as a gate electrode. Work supported by the EU-NMP GRENADA project

  18. Spin transport in epitaxial graphene

    NASA Astrophysics Data System (ADS)

    Tbd, -

    2014-03-01

    Spintronics is a paradigm focusing on spin as the information vector in fast and ultra-low-power non volatile devices such as the new STT-MRAM. Beyond its widely distributed application in data storage it aims at providing more complex architectures and a powerful beyond CMOS solution for information processing. The recent discovery of graphene has opened novel exciting opportunities in terms of functionalities and performances for spintronics devices. We will present experimental results allowing us to assess the potential of graphene for spintronics. We will show that unprecedented highly efficient spin information transport can occur in epitaxial graphene leading to large spin signals and macroscopic spin diffusion lengths (~ 100 microns), a key enabler for the advent of envisioned beyond-CMOS spin-based logic architectures. We will also show that how the device behavior is well explained within the framework of the Valet-Fert drift-diffusion equations. Furthermore, we will show that a thin graphene passivation layer can prevent the oxidation of a ferromagnet, enabling its use in novel humide/ambient low-cost processes for spintronics devices, while keeping its highly surface sensitive spin current polarizer/analyzer behavior and adding new enhanced spin filtering property. These different experiments unveil promising uses of graphene for spintronics.

  19. Microstructure of Co/X (X=Cu,Ag,Au) epitaxial thin films grown on Al{sub 2}O{sub 3}(0001) substrates

    SciTech Connect

    Ohtake, Mitsuru; Akita, Yuta; Futamoto, Masaaki; Kirino, Fumiyoshi

    2007-05-01

    Epitaxial thin films of Co/X (X=Cu,Ag,Au) were prepared on Al{sub 2}O{sub 3}(0001) substrates at substrate temperatures of 100 and 300 degree sign C by UHV molecular beam epitaxy. A complicated microstructure was realized for the epitaxial thin films. In-situ reflection high-energy electron diffraction observation has shown that X atoms of the buffer layer segregated to the surface during Co layer deposition, and it yielded a unique epitaxial granular structure. The structure consists of small Co grains buried in the X buffer layer, where both the magnetic small Co grains and the nonmagnetic X layer are epitaxially grown on the single crystal substrate. The structure varied depending on the X element and the substrate temperature. The crystal structure of Co grains is influenced by the buffer layer material and determined to be hcp and fcc structures for the buffer layer materials of Au and Cu, respectively.

  20. Epitaxial Ni/VO2 heterostructures on Si (001)

    NASA Astrophysics Data System (ADS)

    Singamaneni, Srinivasa Rao; Foley, Gabrielle; Prater, John; Narayan, Jay

    VO2 is a strongly correlated oxide, undergoes a first order metal-insulator (MIT) well above the room temperature 340K. Previous works have shown that the stress associated with structural changes across MIT, VO2 can produce significant changes in magnetic properties of over layer ferromagnetic films such as Ni. This control of the magnetic properties could be very important to many technological applications. However, the current use of r-sapphire as substrate can be restrictive in the microelectronics industry. The previous works focused their studies on polycrystalline Ni and VO2 films, which do not allow the precise controlling of the associated properties due to poor reproducibility of polycrystalline films. We have investigated the magnetic and electronic properties of Ni/VO2 films when epitaxially integrated on Si (001) by pulsed laser deposition using domain matching epitaxy paradigm. Ni was grown both in nanoscale islands and layered form. The XRD results showed that the Ni, VO2and YSZ layers were grown epitaxially in single out of plane orientations. We found that the hysteresis in resistance vs. temperature curves in VO2 thin films was retained even when it is in close proximity with the Ni layer which helped confirm that VO2 layer preserves its characteristic features, revealed the fingerprint magnetic features of Ni layer. We will present and discuss our comprehensive experimental findings.

  1. Growth of Epitaxial Oxide Thin Films on Graphene.

    PubMed

    Zou, Bin; Walker, Clementine; Wang, Kai; Tileli, Vasiliki; Shaforost, Olena; Harrison, Nicholas M; Klein, Norbert; Alford, Neil M; Petrov, Peter K

    2016-01-01

    The transfer process of graphene onto the surface of oxide substrates is well known. However, for many devices, we require high quality oxide thin films on the surface of graphene. This step is not understood. It is not clear why the oxide should adopt the epitaxy of the underlying oxide layer when it is deposited on graphene where there is no lattice match. To date there has been no explanation or suggestion of mechanisms which clarify this step. Here we show a mechanism, supported by first principles simulation and structural characterisation results, for the growth of oxide thin films on graphene. We describe the growth of epitaxial SrTiO3 (STO) thin films on a graphene and show that local defects in the graphene layer (e.g. grain boundaries) act as bridge-pillar spots that enable the epitaxial growth of STO thin films on the surface of the graphene layer. This study, and in particular the suggestion of a mechanism for epitaxial growth of oxides on graphene, offers new directions to exploit the development of oxide/graphene multilayer structures and devices. PMID:27515496

  2. Growth of Epitaxial Oxide Thin Films on Graphene

    PubMed Central

    Zou, Bin; Walker, Clementine; Wang, Kai; Tileli, Vasiliki; Shaforost, Olena; Harrison, Nicholas M.; Klein, Norbert; Alford, Neil M.; Petrov, Peter K.

    2016-01-01

    The transfer process of graphene onto the surface of oxide substrates is well known. However, for many devices, we require high quality oxide thin films on the surface of graphene. This step is not understood. It is not clear why the oxide should adopt the epitaxy of the underlying oxide layer when it is deposited on graphene where there is no lattice match. To date there has been no explanation or suggestion of mechanisms which clarify this step. Here we show a mechanism, supported by first principles simulation and structural characterisation results, for the growth of oxide thin films on graphene. We describe the growth of epitaxial SrTiO3 (STO) thin films on a graphene and show that local defects in the graphene layer (e.g. grain boundaries) act as bridge-pillar spots that enable the epitaxial growth of STO thin films on the surface of the graphene layer. This study, and in particular the suggestion of a mechanism for epitaxial growth of oxides on graphene, offers new directions to exploit the development of oxide/graphene multilayer structures and devices. PMID:27515496

  3. Localized States Influence Spin Transport in Epitaxial Graphene

    NASA Astrophysics Data System (ADS)

    Maassen, T.; van den Berg, J. J.; Huisman, E. H.; Dijkstra, H.; Fromm, F.; Seyller, T.; van Wees, B. J.

    2013-02-01

    We developed a spin transport model for a diffusive channel with coupled localized states that result in an effective increase of spin precession frequencies and a reduction of spin relaxation times in the system. We apply this model to Hanle spin precession measurements obtained on monolayer epitaxial graphene on SiC(0001). Combined with newly performed measurements on quasi-free-standing monolayer epitaxial graphene on SiC(0001) our analysis shows that the different values for the diffusion coefficient measured in charge and spin transport measurements on monolayer epitaxial graphene on SiC(0001) and the high values for the spin relaxation time can be explained by the influence of localized states arising from the buffer layer at the interface between the graphene and the SiC surface.

  4. Electronic property of Na-doped epitaxial graphenes on SiC

    NASA Astrophysics Data System (ADS)

    Choi, Seon-Myeong; Jhi, Seung-Hoon

    2009-04-01

    The electronic property of epitaxial graphenes with Na adsorption or intercalation is studied with the use of pseudopotential density functional method. It is found that the charge transfer and the Na binding energy show strong coverage dependence. Calculated energetics shows that Na prefers the intercalation between the buffer and top graphene layers to the adsorption on top graphene layer. The buffer layer is inert to Na adsorption on top graphene layer but it is charged when Na atoms are intercalated. This indicates that the conduction of epitaxial graphenes can be affected significantly by Na intercalation.

  5. Photoluminescence of heterostructures with GaP{sub 1−x}N{sub x} and GaP{sub 1−x−y}N{sub x}As{sub y} layers grown on GaP and Si substrates by molecular-beam epitaxy

    SciTech Connect

    Lazarenko, A. A. Nikitina, E. V.; Sobolev, M. S.; Pirogov, E. V.; Denisov, D. V.; Egorov, A. Yu.

    2015-04-15

    The structural and optical properties of heterostructures containing GaP{sub 1−x}N{sub x} ternary and GaP{sub 1−x−y}N{sub x}As{sub y} quaternary alloy layers are discussed. The heterostructures are grown by molecular-beam epitaxy on GaP and Si substrates. The structures are studied by the high-resolution X-ray diffraction technique and photoluminescence measurements in a wide temperature range from 10 to 300 K. In the low-temperature photoluminescence spectra of the alloys with a low nitrogen fraction (x < 0.007), two clearly resolved narrow lines attributed to the localized states of nitrogen pairs and the phonon replicas of these lines are observed.

  6. Understanding controls on interfacial wetting at epitaxial graphene: Experiment and Theory

    SciTech Connect

    Zhou, Hua; Ganesh, Panchapakesan; Presser, Volker; Wander, Matthew C; Fenter, Paul; Kent, Paul R; Jiang, Deen; Chialvo, Ariel A; Mcdonough, John; Shuford, Kevin L; Gogotsi, Yury G.

    2012-01-01

    The interaction of interfacial water with graphitic carbon at the atomic scale is studied as a function of the hydrophobicity of epitaxial graphene. High resolution x-ray reflectivity shows that the graphene-water contact angle is controlled by the average graphene thickness, due to the fraction of the film surface expressed as the epitaxial buffer layer whose contact angle (contact angle c = 73 ) is substantially smaller than that of multilayer graphene ( c = 93 ). Classical and ab initio molecular dynamics simulations show that the reduced contact angle of the buffer layer is due to both its epitaxy with the SiC substrate and the presence of interfacial defects. This insight clarifies the relationship between interfacial water structure and hydrophobicity, in general, and suggests new routes to control interface properties of epitaxial graphene.

  7. Understanding controls on interfacial wetting at epitaxial graphene: Experiment and Theory

    SciTech Connect

    Kent, Paul R

    2011-01-01

    The interaction of interfacial water with graphitic carbon at the atomic scale is studied as a function of the hydrophobicity of epitaxial graphene. High resolution x-ray reflectivity shows that the graphene-water contact angle is controlled by the average graphene thickness, due to the fraction of the film surface expressed as the epitaxial buffer layer whose contact angle (contact angle {Theta}{sub c} = 73{sup o}) is substantially smaller than that of multilayer graphene ({Theta}{sub c} = 93{sup o}). Classical and ab initio molecular dynamics simulations show that the reduced contact angle of the buffer layer is due to both its epitaxy with the SiC substrate and the presence of interfacial defects. This insight clarifies the relationship between interfacial water structure and hydrophobicity, in general, and suggests new routes to control interface properties of epitaxial graphene.

  8. Understanding controls on interfacial wetting at epitaxial graphene: Experiment and theory

    NASA Astrophysics Data System (ADS)

    Zhou, Hua; Ganesh, P.; Presser, Volker; Wander, Matthew C. F.; Fenter, Paul; Kent, Paul R. C.; Jiang, De-En; Chialvo, Ariel A.; McDonough, John; Shuford, Kevin L.; Gogotsi, Yury

    2012-01-01

    The interaction of interfacial water with graphitic carbon at the atomic scale is studied as a function of the hydrophobicity of epitaxial graphene. High resolution x-ray reflectivity shows that the graphene-water contact angle is controlled by the average graphene thickness, due to the fraction of the film surface expressed as the epitaxial buffer layer whose contact angle (contact angle θc = 73°) is substantially smaller than that of multilayer graphene (θc = 93°). Classical and ab initio molecular dynamics simulations show that the reduced contact angle of the buffer layer is due to both its epitaxy with the SiC substrate and the presence of interfacial defects. This insight clarifies the relationship between interfacial water structure and hydrophobicity, in general, and suggests new routes to control interface properties of epitaxial graphene.

  9. Spin Polarization of Alternate Monatomic Epitaxial [Fe/Co]n Superlattice

    NASA Astrophysics Data System (ADS)

    Chu, In Chang; Doi, Masaaki; Sahashi, Masashi; Rajanikanth, Ammanabrolu; Takahashi, Yukiko; Hono, Kazuhiro

    2012-09-01

    The spin polarization (P) of alternate monatomic layered (AML) epitaxial [Fe/Co]n superlattices grown on MgO(001) substrates by electron beam (EB) evaporation has been measured by the point contact Andreev reflection (PCAR) method. The intrinsic transport P of 0.60 was obtained for the AML epitaxial [Fe/Co]n superlattice grown at 75 °C, which is comparable to that of half-metallic Heusler alloys measured by PCAR. The AML epitaxial [Fe/Co]n superlattices on MgO(001), which are expected to possess the B2 ordered structure, show the highest spin polarization of metallic Fe-Co alloy films.

  10. Hydrothermal epitaxy of perovskite thin films

    NASA Astrophysics Data System (ADS)

    Chien, Allen T.

    1998-12-01

    This work details the discovery and study of a new process for the growth of epitaxial single crystal thin films which we call hydrothermal epitaxy. Hydrothermal epitaxy is a low temperature solution route for producing heteroepitaxial thin films through the use of solution chemistry and structurally similar substrates. The application of this synthesis route has led to the growth of a variety of epitaxial perovskite (BaTiOsb3, SrTiOsb3, and Pb(Zr,Ti)Osb3 (PZT)) thin films which provides a simple processing pathway for the formation of other materials of technological interest. BaTiOsb3 and PZT heteroepitaxial thin films and powders were produced by the hydrothermal method at 90-200sp°C using various alkali bases. XRD and TEM analysis shows that, in each case, the films and powders form epitaxially with a composition nearly identical to that of the starting precursors. Sequential growth experiments show that film formation initiates by the nucleation of submicron faceted islands at the step edges of the SrTiOsb3 substrates followed by coalescence after longer growth periods. A Ba-rich interfacial layer between the BaTiOsb3 islands and the SrTiOsb3 surface is seen by cross-section TEM during early growth periods. Electrophoretic and Basp{2+} adsorption data provide a chemical basis for the existence of the interfacial layer. Homoepitaxial growth of SrTiOsb3 on SrTiOsb3 also occurs by island growth, suggesting that the growth mode may be a consequence of the aqueous surface chemistry inherent in the process. Film formation is shown to be affected by any number of factors including type of base, pH, temperature, and substrate pretreatments. Different cation bases (Na-, K-, Rb-, Cs-, TMA-OH) demonstrated pronounced changes in powder and film morphology. For example, smaller cation bases (e.g., NaOH, KOH and RbOH) resulted the formation of 1.5 mum \\{100\\} faceted perovskite PbTiOsb3 blocks while larger cation bases (e.g., CsOH and TMA-OH) produced 500 nm sized

  11. Critical issues of complex, epitaxial oxide growth and integration with silicon by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Lettieri, James

    Molecular beam epitaxy was used to grow epitaxial oxides on silicon substrates. The growth of BaO, SrO, EuO, and SrTiO3 are discussed with a focus on the general theme of integration of functional, epitaxial oxides into a silicon environment. Oxidation studies of various metal systems relevant for oxide on silicon epitaxy and integration are reported. Results demonstrate the catalytic nature of an alkaline earth metal at small concentrations to enable the oxidation of the poorly oxidizing metals at pressures lower than during deposition of the pure metal alone. Results from the deposition of various elements are presented. The aspects of the growth of alkaline earth oxides on silicon are explained. The transition from the silicon to the alkaline earth oxide as described through reflection high energy electron diffraction (RHEED) is presented and used to understand issues related to each stage of the growth. High quality, commensurate alkaline earth oxides are grown on silicon at room temperature and P O2 background ˜ 3 x 10-8 Torr. The growth of alkaline earth and rare earth oxide solid solutions and rare earth oxides (EuO) are described. The first reported epitaxial EuO on silicon is reported, enabled by the use of a thin buffer layer (13 A) of SrO. Using a strategy of transition from simple structures to the more complex, the growth of a perovskite (SrTiO3) on silicon is demonstrated. Growth of a structurally optimized perovskite structure entails the transformation of a thin interfacial alkaline earth oxide layer into the initial perovskite cells. SrTiO3 and La-doped SrTiO3 on silicon are used to integrate a piezoelectric relevant for microelectromechanical systems (MEMS) applications and a ferroelectric relevant for a ferroelectric random access memory (FRAM) architecture. A d33 value of over 400 pm/V under bias is measured for the piezoelectric (Pb(Mn1/3Nb 2/3)O3 -PbTiO3) and a remanent polarization of 25 muC/cm2 and fatigue free behavior (>1012 cycles) for a

  12. Progress toward cascade cells made by OM-VPE. [organometallic vapor phase epitaxy

    NASA Technical Reports Server (NTRS)

    Borden, P. G.; Larue, R. A.; Ludowise, M. J.

    1982-01-01

    Organometallic Vapor Phase Epitaxy (COM-VPE) was used to make a sophisticated monolithic cascade cell, with a peak AMO efficiency of 16.6%, not corrected for 14% grid coverage. The cell has 9 epitaxial layers. The top cell is 1.35 microns thick with a 0.1 micron thich emitter. Both cells are heteroface n-p structures. The cascade cell uses metal interconnects. Details of growth and processing are described.

  13. Pinhole-free growth of epitaxial CoSi.sub.2 film on Si(111)

    NASA Technical Reports Server (NTRS)

    Lin, True-Lon (Inventor); Fathauer, Robert W. (Inventor); Grunthaner, Paula J. (Inventor)

    1991-01-01

    Pinhole-free epitaxial CoSi.sub.2 films (14') are fabricated on (111)-oriented silicon substrates (10) with a modified solid phase epitaxy technique which utilizes (1) room temperature stoichiometric (1:2) codeposition of Co and Si followed by (2) room temperature deposition of an amorphous silicon capping layer (16), and (3) in situ annealing at a temperature ranging from about 500.degree. to 750.degree. C.

  14. Suppression of planar defects in the molecular beam epitaxy of GaAs/ErAs/GaAs heterostructures

    SciTech Connect

    Crook, Adam M.; Nair, Hari P.; Ferrer, Domingo A.; Bank, Seth R.

    2011-08-15

    We present a growth method that overcomes the mismatch in rotational symmetry of ErAs and conventional III-V semiconductors, allowing for epitaxially integrated semimetal/semiconductor heterostructures. Transmission electron microscopy and reflection high-energy electron diffraction reveal defect-free overgrowth of ErAs layers, consisting of >2x the total amount of ErAs that can be embedded with conventional layer-by-layer growth methods. We utilize epitaxial ErAs nanoparticles, overgrown with GaAs, as a seed to grow full films of ErAs. Growth proceeds by diffusion of erbium atoms through the GaAs spacer, which remains registered to the underlying substrate, preventing planar defect formation during subsequent GaAs growth. This growth method is promising for metal/semiconductor heterostructures that serve as embedded Ohmic contacts to epitaxial layers and epitaxially integrated active plasmonic devices.

  15. Organometallic vapor phase epitaxial growth of InP using new phosphorus sources

    NASA Astrophysics Data System (ADS)

    Larsen, C. A.; Chen, C. H.; Kitamura, M.; Stringfellow, G. B.; Brown, D. W.; Robertson, A. J.

    1986-06-01

    Two organophosphorus compounds, isobutylphosphine and tertiarybutylphosphine, have been investigated for their possible use as precursors in the organometallic vapor phase epitaxy process. They are the first nonhydride compounds to be used as phosphorus sources. Pyrolysis studies show that the first decomposition products are phosphine and various organic compounds. The phosphine then pyrolyzes to give phosphorus. The materials are less pyrophoric and less toxic than phosphine, and so are safer to use. The compounds have been used to grow epitaxial layers of InP on InP and GaAs substrates. The layers exhibit photoluminescence and electrical properties which are similar to those of layers grown with phosphine.

  16. Highly ordered growth of PTCDA on epitaxial bilayer graphene

    NASA Astrophysics Data System (ADS)

    Meissner, Matthias; Gruenewald, Marco; Sojka, Falko; Udhardt, Christian; Forker, Roman; Fritz, Torsten

    2012-11-01

    For using the unique electronic properties of graphene in future nanoelectronic devices, control of the band structure is essential. While it has been shown already in the literature that this can be achieved by the deposition of organic molecules, little attention has been paid so far to the precise structural characterization of the interface. Here, we report on the epitaxial growth of 3,4,9,10-perylenetetracarboxylic dianhydride (PTCDA) layers on graphene, epitaxially grown on silicon carbide (SiC). The description of low energy electron diffraction (LEED) patterns of graphene on SiC by multiscattering is revisited. By means of a home-made algorithm used to correct radial distortions of the LEED images we are able to provide precise structural data of the PTCDA layers. By that, two different point-on-line types of PTCDA could be identified, one of which has neither been reported on graphite nor on graphene before.

  17. Multifunctional epitaxial systems on silicon substrates

    NASA Astrophysics Data System (ADS)

    Singamaneni, Srinivasa Rao; Prater, John Thomas; Narayan, Jagdish

    2016-09-01

    Multifunctional heterostructures can exhibit a wide range of functional properties, including colossal magneto-resistance, magnetocaloric, and multiferroic behavior, and can display interesting physical phenomena including spin and charge ordering and strong spin-orbit coupling. However, putting this functionality to work remains a challenge. To date, most of the work reported in the literature has dealt with heterostructures deposited onto closely lattice matched insulating substrates such as DyScO3, SrTiO3 (STO), or STO buffered Si(100) using concepts of lattice matching epitaxy (LME). However, strain in heterostructures grown by LME is typically not fully relaxed and the layers contain detrimental defects such as threading dislocations that can significantly degrade the physical properties of the films and adversely affect the device characteristics. In addition, most of the substrates are incompatible with existing CMOS-based technology, where Si (100) substrates dominate. This review discusses recent advances in the integration of multifunctional oxide and non-oxide materials onto silicon substrates. An alternative thin film growth approach, called "domain matching epitaxy," is presented which identifies approaches for minimizing lattice strain and unwanted defects in large misfit systems (7%-25% and higher). This approach broadly allows for the integration of multifunctional materials onto silicon substrates, such that sensing, computation, and response functions can be combined to produce next generation "smart" devices. In general, pulsed laser deposition has been used to epitaxially grow these materials, although the concepts developed here can be extended to other deposition techniques, as well. It will be shown that TiN and yttria-stabilized zirconia template layers provide promising platforms for the integration of new functionality into silicon-based computer chips. This review paper reports on a number of thin-film heterostructure systems that span a

  18. Molecular beam epitaxy and metalorganic chemical vapor deposition growth of epitaxial CdTe on (100) GaAs/Si and (111) GaAs/Si substrates

    NASA Technical Reports Server (NTRS)

    Nouhi, A.; Radhakrishnan, G.; Katz, J.; Koliwad, K.

    1988-01-01

    Epitaxial CdTe has been grown on both (100)GaAs/Si and (111)GaAs/Si substrates. A combination of molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MOCVD) has been employed for the first time to achieve this growth: the GaAs layers are grown on Si substrates by MBE and the CdTe film is subsequently deposited on GaAs/Si by MOCVD. The grown layers have been characterized by X-ray diffraction, scanning electron microscopy, and photoluminescence.

  19. Reducing dislocations in semiconductors utilizing repeated thermal cycling during multistage epitaxial growth

    DOEpatents

    Fan, John C. C.; Tsaur, Bor-Yeu; Gale, Ronald P.; Davis, Frances M.

    1986-12-30

    Dislocation densities are reduced in growing semiconductors from the vapor phase by employing a technique of interrupting growth, cooling the layer so far deposited, and then repeating the process until a high quality active top layer is achieved. The method of interrupted growth, coupled with thermal cycling, permits dislocations to be trapped in the initial stages of epitaxial growth.

  20. Reducing dislocations in semiconductors utilizing repeated thermal cycling during multistage epitaxial growth

    DOEpatents

    Fan, John C. C.; Tsaur, Bor-Yeu; Gale, Ronald P.; Davis, Frances M.

    1992-02-25

    Dislocation densities are reduced in growing semiconductors from the vapor phase by employing a technique of interrupting growth, cooling the layer so far deposited, and then repeating the process until a high quality active top layer is achieved. The method of interrupted growth, coupled with thermal cycling, permits dislocations to be trapped in the initial stages of epitaxial growth.