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Sample records for 6h-sic epitaxial layers

  1. Temperature synchronized molecular layer epitaxy

    NASA Astrophysics Data System (ADS)

    Kurabayashi, T.; Nishizawa, J.

    1994-12-01

    This paper reports the first results on a modified molecular layer epitaxy (MLE) technique to deposit epitaxial GaAs films by changing the substrate temperature for alternate TEG (or TMG) and AsH 3 injection. This method of temperature synchronized molecular layer epitaxy (TSMLE) is a new concept for MLE and atomic layer epitaxy (ALE). The growth rates and the doping phenomena showed different characteristics to the conventional methods which were performed at a constant temperature. This method was effective not only for the study of monolayer growth, but also for device application, especially for the heavily doped p-type layer of which carrier concentration is 10 20 cm -3 order. Carbon doped p-type layer was achieved by TMG-AsH 3 TSMLE. The carbon concentration increased by decreasing the temperature during AsH 3 injection and by increasing the temperature during TMG injection. Zn-doped layer was achieved by TEG-AsH 3 TSMLE using DEZn as a dopant gas for p-type layer fabrication. To doped heavily, DEZn injected after AsH 3 injection and the temperature during AsH 3 injection had a suitable value at 393°C.

  2. Epitaxial growth of silicon for layer transfer

    DOEpatents

    Teplin, Charles; Branz, Howard M

    2015-03-24

    Methods of preparing a thin crystalline silicon film for transfer and devices utilizing a transferred crystalline silicon film are disclosed. The methods include preparing a silicon growth substrate which has an interface defining substance associated with an exterior surface. The methods further include depositing an epitaxial layer of silicon on the silicon growth substrate at the surface and separating the epitaxial layer from the substrate substantially along the plane or other surface defined by the interface defining substance. The epitaxial layer may be utilized as a thin film of crystalline silicon in any type of semiconductor device which requires a crystalline silicon layer. In use, the epitaxial transfer layer may be associated with a secondary substrate.

  3. DEFECT SELECTIVE ETCHING OF THICK ALN LAYERS GROWN ON 6H-SIC SEEDS - A TRANSMISSION ELECTRON MICROSCOPY STUDY

    SciTech Connect

    Nyakiti, Luke; Chaudhari, Jharna; Kenik, Edward A; Lu, Peng; Edgar, J H

    2008-01-01

    In the present study, the type and densities of defects in AlN crystals grown on 6H-SiC seeds by the sublimation-recombination method were assessed. The positions of the defects in AlN were first identified by defect selective etching (DSE) in molten NaOH-KOH at 400 C for 2 minutes. Etching produced pits of three different sizes: 1.77 m, 2.35 m , and 2.86 m. The etch pits were either aligned together forming a sub-grain boundary or randomly distributed. The smaller etch pits were either isolated or associated with larger etch pits. After preparing crosssections of the pits by the focused ion beam (FIB) technique, transmission electron microscopy (TEM) was performed to determine which dislocation type (edge, mixed or screw) produced a specific etch pit sizes. Preliminary TEM bright field and dark field study using different zone axes and diffraction vectors indicates an edge dislocation with a Burgers vector 1/3[1120] is associated with the smallest etch pit size.

  4. Electron holography of devices with epitaxial layers

    SciTech Connect

    Gribelyuk, M. A. Ontalus, V.; Baumann, F. H.; Zhu, Z.; Holt, J. R.

    2014-11-07

    Applicability of electron holography to deep submicron Si devices with epitaxial layers is limited due to lack of the mean inner potential data and effects of the sample tilt. The mean inner potential V{sub 0} = 12.75 V of the intrinsic epitaxial SiGe was measured by electron holography in devices with Ge content C{sub Ge} = 18%. Nanobeam electron diffraction analysis performed on the same device structure showed that SiGe is strain-free in [220] direction. Our results showed good correlation with simulations of the mean inner potential of the strain-free SiGe using density function theory. A new method is proposed in this paper to correct electron holography data for the overlap of potentials of Si and the epitaxial layer, which is caused by the sample tilt. The method was applied to the analysis of the dopant diffusion in p-Field-effect Transistor devices with the identical gate length L = 30 nm, which had alternative SiGe geometry in the source and drain regions and was subjected to different thermal processing. Results have helped to understand electrical data acquired from the same devices in terms of dopant diffusion.

  5. Depositing spacing layers on magnetic film with liquid phase epitaxy

    NASA Technical Reports Server (NTRS)

    Moody, J. W.; Shaw, R. W.; Sanfort, R. M.

    1975-01-01

    Liquid phase epitaxy spacing layer is compatible with systems which are hard-bubble proofed by use of second magnetic garnet film as capping layer. Composite is superior in that: circuit fabrication time is reduced; adherence is superior; visibility is better; and, good match of thermal expansion coefficients is provided.

  6. Electric circuit model for strained-layer epitaxy

    NASA Astrophysics Data System (ADS)

    Kujofsa, Tedi; Ayers, John E.

    2016-11-01

    For the design and analysis of a strained-layer semiconductor device structure, the equilibrium strain profile may be determined numerically by energy minimization but this method is computationally intense and non-intuitive. Here we present an electric circuit model approach for the equilibrium analysis of an epitaxial stack, in which each sublayer may be represented by an analogous configuration involving a current source, a resistor, a voltage source, and an ideal diode. The resulting node voltages in the analogous electric circuit correspond to the equilibrium strains in the original epitaxial structure. This new approach enables analysis using widely accessible circuit simulators, and an intuitive understanding of electric circuits may be translated to the relaxation of strained-layer structures. In this paper, we describe the mathematical foundation of the electrical circuit model and demonstrate its application to epitaxial layers of Si1‑x Ge x grown on a Si (001) substrate.

  7. An ultra-thin buffer layer for Ge epitaxial layers on Si

    SciTech Connect

    Kawano, M.; Yamada, S.; Tanikawa, K.; Miyao, M.; Hamaya, K.; Sawano, K.

    2013-03-25

    Using an Fe{sub 3}Si insertion layer, we study epitaxial growth of Ge layers on a Si substrate by a low-temperature molecular beam epitaxy technique. When we insert only a 10-nm-thick Fe{sub 3}Si layer in between Si and Ge, epitaxial Ge layers can be obtained on Si. The detailed structural characterizations reveal that a large lattice mismatch of {approx}4% is completely relaxed in the Fe{sub 3}Si layer. This means that the Fe{sub 3}Si layers can become ultra-thin buffer layers for Ge on Si. This method will give a way to realize a universal buffer layer for Ge, GaAs, and related devices on a Si platform.

  8. Seed layer technique for high quality epitaxial manganite films

    PubMed Central

    Graziosi, P.; Gambardella, A.; Calbucci, M.; O’Shea, K.; MacLaren, D. A.; Bergenti, I.; Homonnay, N.; Schmidt, G.; Pullini, D.; Busquets-Mataix, D.; Dediu, V.

    2016-01-01

    We introduce an innovative approach to the simultaneous control of growth mode and magnetotransport properties of manganite thin films, based on an easy-to-implement film/substrate interface engineering. The deposition of a manganite seed layer and the optimization of the substrate temperature allows a persistent bi-dimensional epitaxy and robust ferromagnetic properties at the same time. Structural measurements confirm that in such interface-engineered films, the optimal properties are related to improved epitaxy. A new growth scenario is envisaged, compatible with a shift from heteroepitaxy towards pseudo-homoepitaxy. Relevant growth parameters such as formation energy, roughening temperature, strain profile and chemical states are derived.

  9. Seed layer technique for high quality epitaxial manganite films

    NASA Astrophysics Data System (ADS)

    Graziosi, P.; Gambardella, A.; Calbucci, M.; O'Shea, K.; MacLaren, D. A.; Riminucci, A.; Bergenti, I.; Fugattini, S.; Prezioso, M.; Homonnay, N.; Schmidt, G.; Pullini, D.; Busquets-Mataix, D.; Dediu, V.

    2016-08-01

    We introduce an innovative approach to the simultaneous control of growth mode and magnetotransport properties of manganite thin films, based on an easy-to-implement film/substrate interface engineering. The deposition of a manganite seed layer and the optimization of the substrate temperature allows a persistent bi-dimensional epitaxy and robust ferromagnetic properties at the same time. Structural measurements confirm that in such interface-engineered films, the optimal properties are related to improved epitaxy. A new growth scenario is envisaged, compatible with a shift from heteroepitaxy towards pseudo-homoepitaxy. Relevant growth parameters such as formation energy, roughening temperature, strain profile and chemical states are derived.

  10. Seed layer technique for high quality epitaxial manganite films

    PubMed Central

    Graziosi, P.; Gambardella, A.; Calbucci, M.; O’Shea, K.; MacLaren, D. A.; Bergenti, I.; Homonnay, N.; Schmidt, G.; Pullini, D.; Busquets-Mataix, D.; Dediu, V.

    2016-01-01

    We introduce an innovative approach to the simultaneous control of growth mode and magnetotransport properties of manganite thin films, based on an easy-to-implement film/substrate interface engineering. The deposition of a manganite seed layer and the optimization of the substrate temperature allows a persistent bi-dimensional epitaxy and robust ferromagnetic properties at the same time. Structural measurements confirm that in such interface-engineered films, the optimal properties are related to improved epitaxy. A new growth scenario is envisaged, compatible with a shift from heteroepitaxy towards pseudo-homoepitaxy. Relevant growth parameters such as formation energy, roughening temperature, strain profile and chemical states are derived. PMID:27648371

  11. ZnO epitaxy on (111) Si using epitaxial Lu2O3 buffer layers

    NASA Astrophysics Data System (ADS)

    Guo, W.; Allenic, A.; Chen, Y. B.; Pan, X. Q.; Tian, W.; Adamo, C.; Schlom, D. G.

    2008-02-01

    We report the growth and characterization of single-crystalline, crack-free, epitaxial (0001) ZnO films on (111) Si substrates using intervening epitaxial Lu2O3 buffer layers. The epitaxial orientation relationships are (0001)ZnO∥(111)Lu2O3∥(111)Si and [12¯10]ZnO∥[1¯10]Lu2O3∥[11¯0]Si. X-ray diffraction and transmission electron microscopy reveal that the ZnO films have high structural quality and an atomically sharp ZnO /Lu2O3 interface. Temperature-dependent photoluminescence measurements show optical properties comparable to ZnO single crystals. The films have a resistivity of 0.31Ωcm, an electron concentration of 2.5×1017cm-3, and a mobility of 80cm2/Vṡs at room temperature. The epitaxial growth of ZnO on Si represents a significant step toward the integration of ZnO-based multifunctional devices with Si electronics.

  12. Surface morphological evolution of epitaxial CrN(001) layers

    SciTech Connect

    Frederick, J.R.; Gall, D.

    2005-09-01

    CrN layers, 57 and 230 nm thick, were grown on MgO(001) at T{sub s}=600-800 deg. C by ultrahigh-vacuum magnetron sputter deposition in pure N{sub 2} discharges from an oblique deposition angle {alpha}=80 deg. . Layers grown at 600 deg. C nucleate as single crystals with a cube-on-cube epitaxial relationship with the substrate. However, rough surfaces with cauliflower-type morphologies cause the nucleation of misoriented CrN grains that develop into cone-shaped grains that protrude out of the epitaxial matrix to form triangular faceted surface mounds. The surface morphology of epitaxial CrN(001) grown at 700 deg. C is characterized by dendritic ridge patterns extending along the orthogonal <110> directions superposed by square-shaped super mounds with <100> edges. The ridge patterns are attributed to a Bales-Zangwill instability while the supermounds form due to atomic shadowing which leads to the formation of epitaxial inverted pyramids that are separated from the surrounding layer by tilted nanovoids. Growth at 800 deg. C yields complete single crystals with smooth surfaces. The root-mean-square surface roughness for 230-nm-thick layers decreases from 18.8 to 9.3 to 1.1 nm as T{sub s} is raised from 600 to 700 to 800 deg. C. This steep decrease is due to a transition in the roughening mechanism from atomic shadowing to kinetic roughening. Atomic shadowing is dominant at 600 and 700 deg. C, where misoriented grains and supermounds, respectively, capture a larger fraction of the oblique deposition flux in comparison to the surrounding epitaxial matrix, resulting in a high roughening rate that is described by a power law with an exponent {beta}>0.5. In contrast, kinetic roughening controls the surface morphology for T{sub s}=800 deg. C, as well as the epitaxial fraction of the layers grown at 600 and 700 deg. C, yielding relatively smooth surfaces and {beta}{<=}0.27.

  13. Improved radiation tolerance of MAPS using a depleted epitaxial layer

    NASA Astrophysics Data System (ADS)

    Dorokhov, A.; Bertolone, G.; Baudot, J.; Brogna, A. S.; Colledani, C.; Claus, G.; De Masi, R.; Deveaux, M.; Dozière, G.; Dulinski, W.; Fontaine, J.-C.; Goffe, M.; Himmi, A.; Hu-Guo, Ch.; Jaaskelainen, K.; Koziel, M.; Morel, F.; Santos, C.; Specht, M.; Valin, I.; Voutsinas, G.; Wagner, F. M.; Winter, M.

    2010-12-01

    Tracking performance of Monolithic Active Pixel Sensors (MAPS) developed at IPHC (Turchetta, et al., 2001) [1] have been extensively studied (Winter, et al., 2001; Gornushkin, et al., 2002) [2,3]. Numerous sensor prototypes, called MIMOSA, were fabricated and tested since 1999 in order to optimise the charge collection efficiency and power dissipation, to minimise the noise and to increase the readout speed. The radiation tolerance was also investigated. The highest fluence tolerable for a 10 μm pitch device was found to be ˜1013 neq/cm2, while it was only 2×1012 neq/cm2 for a 20 μm pitch device. The purpose of this paper is to show that the tolerance to non-ionising radiation may be extended up to O(10 14) n eq/cm 2. This goal relies on a fabrication process featuring a 15 μm thin, high resistivity ( ˜1 kΩ cm) epitaxial layer. A sensor prototype (MIMOSA-25) was fabricated in this process to explore its detection performance. The depletion depth of the epitaxial layer at standard CMOS voltages ( <5 V) is similar to the layer thickness. Measurements with m.i.p.s show that the charge collected in the seed pixel is at least twice larger for the depleted epitaxial layer than for the undepleted one, translating into a signal-to-noise ratio (SNR) of ˜50. Tests after irradiation have shown that this excellent performance is maintained up to the highest fluence considered ( 3×1013 neq/cm2), making evidence of a significant extension of the radiation tolerance limits of MAPS. Standing for minimum ionising particle.

  14. Energetics of dislocation dipoles in capped epitaxially strained layers

    NASA Astrophysics Data System (ADS)

    Atkinson, A.; Jain, S. C.

    1994-08-01

    Most device structures based on strained epitaxial layers are capped by a second, unstrained layer to increase the mechanical stability of the structure. In order to calculate the energies of these structures it is necessary to synthesize the total energy from the energies of the line defects they contain (interfacial dislocations and dislocation dipoles). The self energies and interaction energies of dislocations and dipoles are calculated and their behavoir examined as a function of their spacing and the thicknesses of the strained and capping layers. The results confirm the observations that capped strained layers are more stable than uncapped ones (of the same strained layer thickness) and that capping layers do not need to be thicker than approximately three times the strained layer thickness. An expression is deduced for the total energy of finite, nonuniform arrays of dipoles in capped layers and, by analogy with a similar earlier expression for dislocation in uncapped layers, it is concluded that the effect of a nonuniformity in the dipole spacing will be to increase the energy of the system compared with that of a uniform array having the same average spacing. The results in this paper can be used to assess the stability of devices and their rate of degradation by strain relaxation.

  15. Epitaxially grown layered MFI-bulk MFI hybrid zeolitic materials.

    PubMed

    Kim, Wun-gwi; Zhang, Xueyi; Lee, Jong Suk; Tsapatsis, Michael; Nair, Sankar

    2012-11-27

    The synthesis of hybrid zeolitic materials with complex micropore-mesopore structures and morphologies is an expanding area of recent interest for a number of applications. Here we report a new type of hybrid zeolite material, composed of a layered zeolite material grown epitaxially on the surface of a bulk zeolite material. Specifically, layered (2-D) MFI sheets were grown on the surface of bulk MFI crystals of different sizes (300 nm and 10 μm), thereby resulting in a hybrid material containing a unique morphology of interconnected micropores (∼0.55 nm) and mesopores (∼3 nm). The structure and morphology of this material, referred to as a "bulk MFI-layered MFI" (BMLM) material, was elucidated by a combination of XRD, TEM, HRTEM, SEM, TGA, and N(2) physisorption techniques. It is conclusively shown that epitaxial growth of the 2-D layered MFI sheets occurs in at least two principal crystallographic directions of the bulk MFI crystal and possibly in the third direction as well. The BMLM material combines the properties of bulk MFI (micropore network and mechanical support) and 2-D layered MFI (large surface roughness, external surface area, and mesoporosity). As an example of the uses of the BMLM material, it was incorporated into a polyimide and fabricated into a composite membrane with enhanced permeability for CO(2) and good CO(2)/CH(4) selectivity for gas separations. SEM-EDX imaging and composition analysis showed that the polyimide and the BMLM interpenetrate into each other, thereby forming a well-adhered polymer/particle microstructure, in contrast with the defective interfacial microstructure obtained using bare MFI particles. Analysis of the gas permeation data with the modified Maxwell model also allows the estimation of the effective volume of the BMLM particles, as well as the CO(2) and CH(4) gas permeabilities of the interpenetrated layer at the BMLM/polyimide interface.

  16. Interface engineering in epitaxial growth of layered oxides via a conducting layer insertion

    SciTech Connect

    Yun, Yu; Meng, Dechao; Wang, Jianlin; Ma, Chao; Zhai, Xiaofang; Huang, Haoliang; Fu, Zhengping; Peng, Ranran; Brown, Gail J.; and others

    2015-07-06

    There is a long-standing challenge in the fabrication of layered oxide epitaxial films due to their thermodynamic phase-instability and the large stacking layer number. Recently, the demand for high-quality thin films is strongly pushed by their promising room-temperature multiferroic properties. Here, we find that by inserting a conducting and lattice matched LaNiO{sub 3} buffer layer, high quality m = 5 Bi{sub 6}FeCoTi{sub 3}O{sub 18} epitaxial films can be fabricated using the laser molecular beam epitaxy, in which the atomic-scale sharp interface between the film and the metallic buffer layer explains the enhanced quality. The magnetic and ferroelectric properties of the high quality Bi{sub 6}FeCoTi{sub 3}O{sub 18} films are studied. This study demonstrates that insertion of the conducting layer is a powerful method in achieving high quality layered oxide thin films, which opens the door to further understand the underline physics and to develop new devices.

  17. Optimization of epitaxial layer design for high brightness tapered lasers

    NASA Astrophysics Data System (ADS)

    Tijero, J. M. G.; Rodriguez, D.; Borruel, L.; Sujecki, S.; Larkins, E. C.; Esquivias, I.

    2005-04-01

    A comparative simulation study of the optical output characteristics of tapered lasers with different epitaxial structure was performed. The simulation model self-consistently solves the steady state electrical and optical equations for the flared unstable resonator and was previously backed by experiments on one of the simulated structures. Three different epitaxial designs emitting at 975 nm were analyzed: a standard single quantum well symmetrically located in the confinement region (s-SQW), a double quantum well also symmetrically located (s-DQW) and an asymmetrically located double quantum well (a-DQW). The symmetric structures have different confinement factor but a similar ratio between the active layer thickness and the confinement factor, dQW/Γ, while the a-DQW has similar confinement factor than the s-SQW, but double dQW/Γ. A better performance is predicted for the a-DQW design, reaching considerably higher output power with good beam quality. The results are interpreted in terms of a lower density of power in the QW in the case of the a-DQW design, thus delaying to higher output power the onset of the non-linear effects that degrade the beam quality. The role of dQW/Γ as a figure of merit for high brightness tapered lasers is emphasized.

  18. Substrate-induced magnetism in epitaxial graphene buffer layers.

    PubMed

    Ramasubramaniam, A; Medhekar, N V; Shenoy, V B

    2009-07-01

    Magnetism in graphene is of fundamental as well as technological interest, with potential applications in molecular magnets and spintronic devices. While defects and/or adsorbates in freestanding graphene nanoribbons and graphene sheets have been shown to cause itinerant magnetism, controlling the density and distribution of defects and adsorbates is in general difficult. We show from first principles calculations that graphene buffer layers on SiC(0001) can also show intrinsic magnetism. The formation of graphene-substrate chemical bonds disrupts the graphene pi-bonds and causes localization of graphene states near the Fermi level. Exchange interactions between these states lead to itinerant magnetism in the graphene buffer layer. We demonstrate the occurrence of magnetism in graphene buffer layers on both bulk-terminated as well as more realistic adatom-terminated SiC(0001) surfaces. Our calculations show that adatom density has a profound effect on the spin distribution in the graphene buffer layer, thereby providing a means of engineering magnetism in epitaxial graphene.

  19. Recent Advances in Pulsed Laser Deposition of Epitaxial Layers

    NASA Astrophysics Data System (ADS)

    Venkatesan, T.

    1997-03-01

    While pulsed laser deposition became popular with the emergance of high temperature superconductors the technique has been rapidly deployed in the development of a number of other oxide materials such as ferroelectric titanates, colossal magneto-resistive manganites, electro-optic tantalates and niobates(Pulsed Laser Deposition of Thin Films, eds. D.B. Chrisey and G.K. Hubler, John Wiley and Sons, New York, 1994.). Most recently this technique has also been used succesfully for the fabrication of a variety of semiconductor materials such as sulfides and nitrides with the Group II and Group III cationic species respectively. Details on the fabrication of a hetero-epitaxial family of AlN (Eg = 6.2 eV), GaN (Eg = 3.6 eV) and TiN (metallic with ρ = 14 μΩ-cm) on sapphire substrates will be discussed. Interesting results in the integration of oxides both as buffer layers for improved epitaxy on sapphire as well as conducting layers for both Ohmic and Schottky contacts on the nitrides will be discussed. Some recent details on the elimination of particles in the fabricated films by the use of off-axis deposition and by the use of a shadow mask and scalling issues will be elaborated on. Work in collaboration with R. Ramesh, R. P. Sharma, M. Rajeswari, Z. W. Dong, Z. Trajanovic, V. Talyanski, R. D. Vispute, L. Salamanca-Riba, (UMD); K. Jones, M. Wood, R. Lareau (ARL-SEDD, Fort Monmouth); M. Spenser (Howard U); S. M. Green, S. Harshavardhan and A. Pique (Neocera, Inc.).

  20. Electron molecular beam epitaxy: Layer-by-layer growth of complex oxides via pulsed electron-beam deposition

    NASA Astrophysics Data System (ADS)

    Comes, Ryan; Gu, Man; Khokhlov, Mikhail; Liu, Hongxue; Lu, Jiwei; Wolf, Stuart A.

    2013-01-01

    Complex oxide epitaxial film growth is a rich and exciting field, owing to the wide variety of physical properties present in oxides. These properties include ferroelectricity, ferromagnetism, spin-polarization, and a variety of other correlated phenomena. Traditionally, high quality epitaxial oxide films have been grown via oxide molecular beam epitaxy or pulsed laser deposition. Here, we present the growth of high quality epitaxial films using an alternative approach, the pulsed electron-beam deposition technique. We demonstrate all three epitaxial growth modes in different oxide systems: Frank-van der Merwe (layer-by-layer); Stranski-Krastanov (layer-then-island); and Volmer-Weber (island). Analysis of film quality and morphology is presented and techniques to optimize the morphology of films are discussed.

  1. Defect Formation in GaN Epitaxial Layers due to SHI Irradiation

    SciTech Connect

    Kumar, Ashish; Kumar, V.; Singh, R.; Kanjilal, D.

    2011-07-15

    GaN epitaxial layers were irradiated with 200 MeV swift heavy Ag ions at various fluences. These samples were then characterized by XRD and TEM. Increase in peak width (FWHM) with incident ion dose showed reduction in crystallinity of epitaxial layers. Cross sectional TEM images confirmed that at highest fluence (5x10{sup 12} ions/cm{sup 2}) electronic energy loss process caused structural defect formation in GaN layer.

  2. The role of Energy Deposition in the Epitaxial Layer in Triggering SEGR in Power MOSFETs

    NASA Technical Reports Server (NTRS)

    Selva, L.; Swift, G.; Taylor, W.; Edmonds, L.

    1999-01-01

    In these SEGR experiments, three identical-oxide MOSFET types were irradiated with six ions of significantly different ranges. Results show the prime importance of the total energy deposited in the epitaxial layer.

  3. Epitaxially guided assembly of collagen layers on mica surfaces.

    PubMed

    Leow, Wee Wen; Hwang, Wonmuk

    2011-09-01

    Ordered assembly of collagen molecules on flat substrates has potential for various applications and serves as a model system for studying the assembly process. While previous studies demonstrated self-assembly of collagen on muscovite mica into highly ordered layers, the mechanism by which different conditions affect the resulting morphology remains to be elucidated. Using atomic force microscopy, we follow the assembly of collagen on muscovite mica at a concentration lower than the critical fibrillogenesis concentration in bulk. Initially, individual collagen molecules adsorb to mica and subsequently nucleate into fibrils possessing the 67 nm D-periodic bands. Emergence of fibrils aligned in parallel despite large interfibril distances agrees with an alignment mechanism guided by the underlying mica. The epitaxial growth was further confirmed by the formation of novel triangular networks of collagen fibrils on phlogopite mica, whose surface lattice is known to have a hexagonal symmetry, whereas the more widely used muscovite does not. Comparing collagen assembly on the two types of mica at different potassium concentrations revealed that potassium binds to the negatively charged mica surface and neutralizes it, thereby reducing the binding affinity of collagen and enhancing surface diffusion. These results suggest that collagen assembly on mica follows the surface adsorption, diffusion, nucleation, and growth pathway, where the growth direction is determined at the nucleation step. Comparison with other molecules that assemble similarly on mica supports generality of the proposed assembly mechanism, the knowledge of which will be useful for controlling the resulting surface morphologies.

  4. Characterization of silicon-germanium epitaxial layer by photoluminescence intensity and reflectance measurement techniques.

    PubMed

    Back, Dohyun; Lee, Jaehyeong

    2014-12-01

    Si(1-x)Ge(x) epitaxial layers with various Ge fractions sample were characterized by photoluminescence intensity method at room temperature. Photoluminescence intensity was affected by minority carrier lifetime, defect density, and surface condition. PL intensity profile showed misfit dislocation on epitaxial layer for 15%, 21%, 24%, and 26%, since dislocations were one of minority carrier lifetime degradation parameters. It clearly showed misfit dislocation profiles, cross-hatch, and PL intensity was low at dislocation region.

  5. Epitaxial growth of tungsten layers on MgO(001)

    SciTech Connect

    Zheng, Pengyuan; Ozsdolay, Brian D.; Gall, Daniel

    2015-11-15

    Smooth single crystal W(001) layers were grown on MgO(001) substrates by magnetron sputtering at 900 °C. X-ray diffraction ω–2θ scans, ω-rocking curves, pole figures, and reciprocal space maps indicate a 45°-rotated epitaxial relationship: (001){sub W}‖(001){sub MgO} and [010]{sub W}‖[110]{sub MgO}, and a relaxed lattice constant of 3.167 ± 0.001 nm. A residual in-plane biaxial compressive strain is primarily attributed to differential thermal contraction after growth and decreases from −0.012 ± 0.001 to −0.001 ± 0.001 with increasing layer thickness d = 4.8–390 nm, suggesting relaxation during cooling by misfit dislocation growth through threading dislocation glide. The in-plane x-ray coherence length increases from 3.4 to 33.6 nm for d = 4.8–390 nm, while the out-of-plane x-ray coherence length is identical to the layer thickness for d ≤ 20 nm, but is smaller than d for d ≥ 49.7 nm, indicating local strain variations along the film growth direction. X-ray reflectivity analyses indicate that the root-mean-square surface roughness increases from 0.50 ± 0.05 to 0.95 ± 0.05 nm for d = 4.8–19.9 nm, suggesting a roughness exponent of 0.38, but remains relatively constant for d > 20 nm with a roughness of 1.00 ± 0.05 nm at d = 47.9 nm.

  6. Electrical properties of Si:Er/Si layers grown by sublimation molecular-beam epitaxy

    SciTech Connect

    Belova, O. V.; Shabanov, V. N.; Kasatkin, A. P.; Kuznetsov, O. A.; Yablonskii, A. N.; Kuznetsov, M. V.; Kuznetsov, V. P. Kornaukhov, A. V.; Andreev, B. A.; Krasil'nik, Z. F.

    2008-02-15

    Temperature dependences of the concentration and electron Hall mobility in Si:Er/Sr epitaxial layers grown at T = 600 Degree-Sign C and annealed at 700 or 900 Degree-Sign C have been investigated. The layers were grown by sublimation molecular-beam epitaxy in vacuum ({approx}10{sup -5} Pa). The energy levels of Er-related donor centers are located 0.21-0.27 eV below the bottom of the conduction band of Si. In the range 80-300 K, the electron Hall mobility in unannealed Si:Er epitaxial layers was lower than that in Czochralski-grown single crystals by a factor of 3-10. After annealing the layers, the fraction of electron scattering from Er donor centers significantly decreases.

  7. Electrical properties of Si:Er/Si layers grown by sublimation molecular-beam epitaxy

    SciTech Connect

    Belova, O. V.; Shabanov, V. N.; Kasatkin, A. P.; Kuznetsov, O. A.; Yablonskii, A. N.; Kuznetsov, M. V.; Kuznetsov, V. P. Kornaukhov, A. V.; Andreev, B. A.; Krasil'nik, Z. F.

    2008-02-15

    Temperature dependences of the concentration and electron Hall mobility in Si:Er/Sr epitaxial layers grown at T = 600 deg. C and annealed at 700 or 900 deg. C have been investigated. The layers were grown by sublimation molecular-beam epitaxy in vacuum ({approx}10{sup -5} Pa). The energy levels of Er-related donor centers are located 0.21-0.27 eV below the bottom of the conduction band of Si. In the range 80-300 K, the electron Hall mobility in unannealed Si:Er epitaxial layers was lower than that in Czochralski-grown single crystals by a factor of 3-10. After annealing the layers, the fraction of electron scattering from Er donor centers significantly decreases.

  8. Process for forming epitaxial perovskite thin film layers using halide precursors

    DOEpatents

    Clem, Paul G.; Rodriguez, Mark A.; Voigt, James A.; Ashley, Carol S.

    2001-01-01

    A process for forming an epitaxial perovskite-phase thin film on a substrate. This thin film can act as a buffer layer between a Ni substrate and a YBa.sub.2 Cu.sub.3 O.sub.7-x superconductor layer. The process utilizes alkali or alkaline metal acetates dissolved in halogenated organic acid along with titanium isopropoxide to dip or spin-coat the substrate which is then heated to about 700.degree. C. in an inert gas atmosphere to form the epitaxial film on the substrate. The YBCO superconductor can then be deposited on the layer formed by this invention.

  9. Fabrication of magnetic tunnel junctions with epitaxial and textured ferromagnetic layers

    DOEpatents

    Chang, Y. Austin; Yang, Jianhua Joshua

    2008-11-11

    This invention relates to magnetic tunnel junctions and methods for making the magnetic tunnel junctions. The magnetic tunnel junctions include a tunnel barrier oxide layer sandwiched between two ferromagnetic layers both of which are epitaxial or textured with respect to the underlying substrate upon which the magnetic tunnel junctions are grown. The magnetic tunnel junctions provide improved magnetic properties, sharper interfaces and few defects.

  10. Epitaxially grown polycrystalline silicon thin-film solar cells on solid-phase crystallised seed layers

    NASA Astrophysics Data System (ADS)

    Li, Wei; Varlamov, Sergey; Xue, Chaowei

    2014-09-01

    This paper presents the fabrication of poly-Si thin film solar cells on glass substrates using seed layer approach. The solid-phase crystallised P-doped seed layer is not only used as the crystalline template for the epitaxial growth but also as the emitter for the solar cell structure. This paper investigates two important factors, surface cleaning and intragrain defects elimination for the seed layer, which can greatly influence the epitaxial grown solar cell performance. Shorter incubation and crystallisation time is observed using a simplified RCA cleaning than the other two wet chemical cleaning methods, indicating a cleaner seed layer surface is achieved. Cross sectional transmission microscope images confirm a crystallographic transferal of information from the simplified RCA cleaned seed layer into the epi-layer. RTA for the SPC seed layer can effectively eliminate the intragrain defects in the seed layer and improve structural quality of both of the seed layer and the epi-layer. Consequently, epitaxial grown poly-Si solar cell on the RTA treated seed layer shows better solar cell efficiency, Voc and Jsc than the one on the seed layer without RTA treatment.

  11. Thermodynamic analysis of the concentration profiles of epitaxial layers of nonideal solid solutions

    SciTech Connect

    Kazakov, A.I.; Kishmar, I.N.; Mokritskii, V.A.; Yakubovskii, M.V.

    1988-03-01

    Based on thermodynamic analysis employing the quasiregular approach a mathematical model of the process of equilibrium crystallization of nonideal three-component solid solutions of compounds of the type A/sup III/B/sup V/ from a restricted volume of a solution in a melt was constructed. This model enables calculation of the distribution of the components over the thickness of the epitaxial layer for low rates of cooling of the solution in a melt. The computer calculations of the concentration profiles of the epitaxial layers of Ga/sub 1-x/Al/sub x/ agreed well with the experimental data for thicknesses of the epitaxial layers up to 20 ..mu..m. For high rates of cooling the mass transfer in the volume of the solution in a melt must be taken into account.

  12. Dependence of the concentration of ionized donors on epitaxy temperature for Si:Er/Si layers grown by sublimation molecular-beam epitaxy

    SciTech Connect

    Kuznetsov, V. P.; Shmagin, V. B.; Drozdov, M. N.; Marychev, M. O.; Kudryavtsev, K. E.; Kuznetsov, M. V.; Andreev, B. A.; Kornaukhov, A. V.; Krasilnik, Z. F.

    2011-01-15

    The dependence of the concentrations of the Er impurity and ionized donors on the epitaxy temperature has been studied before and after annealing of Si:Er/Si layers grown by sublimation molecular-beam epitaxy. n-Si:Er layers have been grown in the temperature range 400-800 Degree-Sign C and annealed in hydrogen atmosphere at a temperature of 800 Degree-Sign C for 30 min. The possible nature of the donor centers is discussed.

  13. Ferroelectric Pb(Zr,Ti)O{sub 3} epitaxial layers on GaAs

    SciTech Connect

    Louahadj, L.; Le Bourdais, D.; Agnus, G.; Pillard, V.; Lecoeur, P.; Largeau, L.; Mazet, L.; Bachelet, R.; Regreny, P.; Dubourdieu, C.; Gautier, B.; Saint-Girons, G.; Albertini, D.

    2013-11-18

    Ferroelectric epitaxial Pb(Zr,Ti)O{sub 3} (PZT) layers were grown by pulsed laser deposition on SrTiO{sub 3}/GaAs templates fabricated by molecular beam epitaxy. The templates present an excellent structural quality and the SrTiO{sub 3}/GaAs is abrupt at the atomic scale. The PZT layers contain a- and c-domains, as shown by X-Ray diffraction analyses. Piezoforce microscopy experiments and macroscopic electrical characterizations indicate that PZT is ferroelectric. A relative dielectric permittivity of 164 is extracted from these measurements.

  14. InGaN light emitting diodes with a nanopipe layer formed from the GaN epitaxial layer.

    PubMed

    Hsu, Wei-Ju; Chen, Kuei-Ting; Huang, Wan-Chun; Wu, Chia-Jung; Dai, Jing-Jie; Chen, Sy-Hann; Lin, Chia-Feng

    2016-05-30

    A Si-heavy doped GaN:Si epitaxial layer is transformed into a directional nanopipe GaN layer through a laser-scribing process and a selectively electrochemical (EC) etching process. InGaN light-emitting diodes (LEDs) with an EC-treated nanopipe GaN layer have a high light extraction efficiency. The direction of the nanopipe structure was directed perpendicular to the laser scribing line and was guided by an external bias electric field. An InGaN LED structure with an embedded nanopipe GaN layer can enhance external quantum efficiency through a one-step epitaxial growth process and a selective EC etching process. A birefringence optical property and a low effective refractive index were observed in the directional-nanopipe GaN layer.

  15. InGaN light emitting diodes with a nanopipe layer formed from the GaN epitaxial layer.

    PubMed

    Hsu, Wei-Ju; Chen, Kuei-Ting; Huang, Wan-Chun; Wu, Chia-Jung; Dai, Jing-Jie; Chen, Sy-Hann; Lin, Chia-Feng

    2016-05-30

    A Si-heavy doped GaN:Si epitaxial layer is transformed into a directional nanopipe GaN layer through a laser-scribing process and a selectively electrochemical (EC) etching process. InGaN light-emitting diodes (LEDs) with an EC-treated nanopipe GaN layer have a high light extraction efficiency. The direction of the nanopipe structure was directed perpendicular to the laser scribing line and was guided by an external bias electric field. An InGaN LED structure with an embedded nanopipe GaN layer can enhance external quantum efficiency through a one-step epitaxial growth process and a selective EC etching process. A birefringence optical property and a low effective refractive index were observed in the directional-nanopipe GaN layer. PMID:27410087

  16. Assessment of crystal quality and unit cell orientation in epitaxial Cu₂ZnSnSe₄ layers using polarized Raman scattering.

    PubMed

    Krämmer, Christoph; Lang, Mario; Redinger, Alex; Sachs, Johannes; Gao, Chao; Kalt, Heinz; Siebentritt, Susanne; Hetterich, Michael

    2014-11-17

    We use polarization-resolved Raman spectroscopy to assess the crystal quality of epitaxial kesterite layers. It is demonstrated for the example of epitaxial Cu₂ZnSnSe₄ layers on GaAs(001) that "standing" and "lying" kesterite unit cell orientations (c'-axis parallel / perpendicular to the growth direction) can be distinguished by the application of Raman tensor analysis. From the appearance of characteristic intensity oscillations when the sample is rotated one can distinguish polycrystalline and epitaxial layers. The method can be transferred to kesterite layers oriented in any crystal direction and can shed light on the growth of such layers in general. PMID:25402065

  17. Growth and characterization of molecular beam epitaxial GaAs layers on porous silicon

    NASA Technical Reports Server (NTRS)

    Lin, T. L.; Liu, J. K.; Sadwick, L.; Wang, K. L.; Kao, Y. C.

    1987-01-01

    GaAs layers have been grown on porous silicon (PS) substrates with good crystallinity by molecular beam epitaxy. In spite of the surface irregularity of PS substrates, no surface morphology deterioration was observed on epitaxial GaAs overlayers. A 10-percent Rutherford backscattering spectroscopy minimum channeling yield for GaAs-on-PS layers as compared to 16 percent for GaAs-on-Si layers grown under the same condition indicates a possible improvement of crystallinity when GaAs is grown on PS. Transmission electron microscopy reveals that the dominant defects in the GaAs-on-PS layers are microtwins and stacking faults, which originate from the GaAs/PS interface. GaAs is found to penetrate into the PS layers. n-type GaAs/p-type PS heterojunction diodes were fabricated with good rectifying characteristics.

  18. Study of the structural quality of GaN epitaxial layers obtained by hydride vapor phase epitaxy using a low-temperature buffer layer

    NASA Astrophysics Data System (ADS)

    Belogorohov, I. A.; Donskov, A. A.; Knyazev, S. N.; Kozlova, Yu. P.; Pavlov, V. F.; Yugova, T. G.

    2015-11-01

    The structural quality and surface morphology of low-temperature (LT) buffer layers after deposition and high-temperature (HT) annealing and HT GaN layers grown on LT buffer layers by hydride vapor phase epitaxy have been investigated. The HCl flow rate through the Ga source varied from 0.3 to 2 L/h, and the carrier gas N2 flow rate was either 18 or 60 L/h. It is established that the structural quality of LT GaN buffer is determined to a great extent by the HCl and N2 flow rates; the best results are obtained at HCl and N2 flow rates of 0.3 and 18 L/h, respectively. These GaN layers are characterized by a mirror surface and a rocking curve half-width of 360". It is suggested that the layer structure is improved due to the increase in the lateral growth rate.

  19. Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization

    SciTech Connect

    Kraus, Theodore J.; Nepomnyashchii, Alexander B.; Parkinson, B. A.

    2015-01-15

    Atomic layer deposition was used to grow epitaxial layers of anatase (001) TiO{sub 2} on the surface of SrTiO{sub 3} (100) crystals with a 3% lattice mismatch. The epilayers grow as anatase (001) as confirmed by x-ray diffraction. Atomic force microscope images of deposited films showed epitaxial layer-by-layer growth up to about 10 nm, whereas thicker films, of up to 32 nm, revealed the formation of 2–5 nm anatase nanocrystallites oriented in the (001) direction. The anatase epilayers were used as substrates for dye sensitization. The as received strontium titanate crystal was not sensitized with a ruthenium-based dye (N3) or a thiacyanine dye (G15); however, photocurrent from excited state electron injection from these dyes was observed when adsorbed on the anatase epilayers. These results show that highly ordered anatase surfaces can be grown on an easily obtained substrate crystal.

  20. Gallium Arsenide Layers Grown by Molecular Beam Epitaxy on Single Crystalline Germanium Islands on Insulator

    NASA Astrophysics Data System (ADS)

    Takai, Mikio; Tanigawa, Takaho; Minamisono, Tadanori; Gamo, Kenji; Namba, Susumu

    1984-05-01

    Gallium arsenide (GaAs) layers have successfully been grown by molecular beam epitaxy on single crystalline germanium (Ge) islands, recrystallized by zone melting with SiO2 capping layers, on thermally-oxidized Si-wafers. The GaAs layers, grown on the single crystalline Ge islands, show smooth surfaces without any grain-boundaries, while those, grown on the Ge islands with grain-boundaries and on the SiO2, have grain-boundaries. The GaAs layers on the single crystalline Ge islands emit photoluminescence, the intensity of which is almost comparable to that of GaAs layers on bulk Ge crystals.

  1. Growth mechanisms for Si epitaxy on O atomic layers: Impact of O-content and surface structure

    NASA Astrophysics Data System (ADS)

    Jayachandran, Suseendran; Billen, Arne; Douhard, Bastien; Conard, Thierry; Meersschaut, Johan; Moussa, Alain; Caymax, Matty; Bender, Hugo; Vandervorst, Wilfried; Heyns, Marc; Delabie, Annelies

    2016-10-01

    The epitaxial growth of Si layers on Si substrates in the presence of O atoms is generally considered a challenge, as O atoms degrade the epitaxial quality by generating defects. Here, we investigate the growth mechanisms for Si epitaxy on O atomic layers (ALs) with different O-contents and structures. O ALs are deposited by ozone (O3) or oxygen (O2) exposure on H-terminated Si at 50 °C and 300 °C respectively. Epitaxial Si is deposited by chemical vapor deposition using silane (SiH4) at 500 °C. After O3 exposure, the O atoms are uniformly distributed in Si-Si dimer/back bonds. This O layer still allows epitaxial seeding of Si. The epitaxial quality is enhanced by lowering the surface distortions due to O atoms and by decreasing the arrival rate of SiH4 reactants, allowing more time for surface diffusion. After O2 exposure, the O atoms are present in the form of SiOx clusters. Regions of hydrogen-terminated Si remain present between the SiOx clusters. The epitaxial seeding of Si in these structures is realized on H-Si regions, and an epitaxial layer grows by a lateral overgrowth mechanism. A breakdown in the epitaxial ordering occurs at a critical Si thickness, presumably by accumulation of surface roughness.

  2. Effect of buffer layer growth temperature on epitaxial GaN films deposited by magnetron sputtering

    SciTech Connect

    Mohanta, P.; Singh, D.; Kumar, R.; Ganguli, T.; Srinivasa, R. S.; Major, S. S.

    2012-06-05

    Epitaxial GaN films were deposited by reactive sputtering of a GaAs target in 100 % nitrogen at 700 deg. C on ZnO buffer layers grown at different substrate temperatures over sapphire substrates. High resolution X-ray diffraction measurements and the corresponding analysis show that the growth temperature of buffer layers significantly affects the micro-structural parameters of GaN epilayer, such as lateral coherence length, tilt and twist, while the vertical coherence length remains unaffected. The optimum substrate temperature for buffer layer growth has been found to be 300 deg. C. High epitaxial quality GaN film grown on such a buffer layer exhibited micro strain of 1.8x10{sup -4} along with screw and edge type dislocation densities of 7.87x10{sup 9} and 1.16x10{sup 11}, respectively.

  3. Low-temperature growth of silicon epitaxial layers codoped with erbium and oxygen atoms

    SciTech Connect

    Shengurov, D. V.; Chalkov, V. Yu.; Denisov, S. A.; Shengurov, V. G.; Stepikhova, M. V.; Drozdov, M. N.; Krasilnik, Z. F.

    2013-03-15

    The fabrication technology and properties of light-emitting Si structures codoped with erbium and oxygen are reported. The layers are deposited onto (100) Si by molecular beam epitaxy (MBE) using an Er-doped silicon sublimation source. The partial pressure of the oxygen-containing gases in the growth chamber of the MBE facility before layer growth is lower than 5 Multiplication-Sign 10{sup -10} Torr. The oxygen and erbium concentrations in the Si layers grown at 450 Degree-Sign C is {approx}1 Multiplication-Sign 10{sup 19} and 10{sup 18} cm{sup -3}, respectively. The silicon epitaxial layers codoped with erbium and oxygen have high crystal quality and yield effective photoluminescence and electroluminescence signals with the dominant optically active Er-1 center forming upon postgrowth annealing at a temperature of 800 Degree-Sign C.

  4. Atomic layer epitaxy of hematite on indium tin oxide for application in solar energy conversion

    DOEpatents

    Martinson, Alex B.; Riha, Shannon; Guo, Peijun; Emery, Jonathan D.

    2016-07-12

    A method to provide an article of manufacture of iron oxide on indium tin oxide for solar energy conversion. An atomic layer epitaxy method is used to deposit an uncommon bixbytite-phase iron (III) oxide (.beta.-Fe.sub.2O.sub.3) which is deposited at low temperatures to provide 99% phase pure .beta.-Fe.sub.2O.sub.3 thin films on indium tin oxide. Subsequent annealing produces pure .alpha.-Fe.sub.2O.sub.3 with well-defined epitaxy via a topotactic transition. These highly crystalline films in the ultra thin film limit enable high efficiency photoelectrochemical chemical water splitting.

  5. Origin and reduction of impurities at GaAs epitaxial layer-substrate interfaces

    NASA Astrophysics Data System (ADS)

    Kanber, H.; Yang, H. T.; Zielinski, T.; Whelan, J. M.

    1988-09-01

    Surface cleaning techniques used for semi-insulating GaAs substrates prior to epitaxial growth can have an important and sometimes detrimental effect on the quality and characteristics of epitaxial layers that are grown on them. We observe that a HF rinse followed by a 5:1:1 H 2SO 4:H 2O 2:H 2O etch and H 2O rinse drastically reduced the maximum concentrations and total amount of both SIMS detected S and Si for MOCVD grown GaAs undoped epitaxial layers. Subsequent final HCl and H 2O reduced the S interfacial residues to the SIMS detection limit. Total amounts of residual Si are estimated to be equivalent to 10 -2 to 10 -3 monolayers. Residual S is less. Alternately the S residue can be comparable reduced by a HF rinse followed by a NH 4OH:H 2O 2:H 2O etch and H 2O rinse. Hot aqueous HCl removes S but not Si residues. The Si residue is not electrically active and most likely exists as islands of SiO 2. The relative significance of the impurity residues is most pronounced for halide VPE, smaller for MBE and least for MOCVD grown GaAs epitaxial layers.

  6. Epitaxial composite layers of electron donors and acceptors from very large polycyclic aromatic hydrocarbons.

    PubMed

    Samorí, Paolo; Severin, Nikolai; Simpson, Christopher D; Müllen, Klaus; Rabe, Jürgen P

    2002-08-14

    Large polycyclic aromatic hydrocarbons (PAHs) can be considered as nanographenes, whose electron donating or accepting properties are controlled by their size and shape as well as functionalities in their periphery. Epitaxial thin films of them are targets for optoelectronic applications; however, large PAHs are increasingly difficult to process. Here we show that epitaxial layers of very large unsubstituted PAHs (C(42)H(18) and C(132)H(34)), as well as a mixed layer of C(42)H(18) with an electron acceptor, can be obtained by self-assembly from solution. The C(132)H(34) is by far the largest nanographene that up to now has been processed into ordered thin films; due to its size it cannot be sublimed in a vacuum. Scanning tunneling microscopy (STM) studies reveal that the interaction with the substrate induces a strong perturbation of the electronic structure of the pure donor in the first epitaxial monolayer. In a second epitaxial layer with a donor acceptor stoichiometry of 2:1 the molecules are unperturbed.

  7. Investigation of epitaxial silicon layers as a material for radiation hardened silicon detectors

    SciTech Connect

    Li, Z.; Eremin, V.; Ilyashenko, I.; Ivanov, A.; Verbitskaya, E.; CERN RD-48 ROSE Collaboration

    1997-12-01

    Epitaxial grown thick layers ({ge} 100 micrometers) of high resistivity silicon (Epi-Si) have been investigated as a possible candidate of radiation hardened material for detectors for high-energy physics. As grown Epi-Si layers contain high concentration (up to 2 {times} 10{sup 12} cm{sup {minus}3}) of deep levels compared with that in standard high resistivity bulk Si. After irradiation of test diodes by protons (E{sub p} = 24 GeV) with a fluence of 1.5 {times} 10{sup 11} cm{sup {minus}2}, no additional radiation induced deep traps have been detected. A reasonable explanation is that there is a sink of primary radiation induced defects (interstitial and vacancies), possibly by as-grown defects, in epitaxial layers. The ``sinking`` process, however, becomes non-effective at high radiation fluences (10{sup 14} cm{sup {minus}2}) due to saturation of epitaxial defects by high concentration of radiation induced ones. As a result, at neutron fluence of 1 {times} 10{sup 14} cm{sup {minus}2} the deep level spectrum corresponds to well-known spectrum of radiation induced defects in high resistivity bulk Si. The net effective concentration in the space charge region equals to 3 {times} 10{sup 12} cm{sup {minus}3} after 3 months of room temperature storage and reveals similar annealing behavior for epitaxial as compared to bulk silicon.

  8. Characterization and growth of epitaxial layers of Gs exhibiting high resistivity for ionic implantation

    NASA Technical Reports Server (NTRS)

    1979-01-01

    Either classical or low temperature epitaxial growth techniques can be used to control the deposition of buffer layers of GaAs on semiconducting substrates and to obtain the resistivity and purity desired. Techniques developed to study, as a function of thickness, the evolution of mobilities by photoHall, and the spectroscopy of shallow and deep centers by cathodoluminescence and current transients reveal one very pure layer of medium resistivity and high mobility, and another "dead layer" of elevated resistivity far from the surface. The highly resistive layer remains pure over several microns, which appears interesting for implantation.

  9. Defect formation and carrier doping in epitaxial films of the infinite layer compound

    SciTech Connect

    Feenstra, R.; Pennycook, S.J.; Chisholm, M.F.

    1996-02-01

    The correlation between defect formation and carrier doping in epitaxial films of the infinite layer compound SrCuO{sub 2} has been studied via molecular beam epitaxy controlled layer-by-layer growth experiments, chemically resolved scanning transmission electron microscopy, scanning tunneling microscopy, x-ray diffraction, electrical transport measurements, and post-growth oxidation-reduction annealing. Based on the complementary information provided by these experiments, it is concluded that the carrier doping is dominated by the formation of an electron-doped, Sr and O deficient matrix under mildly oxidizing growth conditions. Hole-doping is induced by extended defects containing excess Sr atoms and may lead to superconductivity after high-temperature oxidation.

  10. Lattice-matched HfN buffer layers for epitaxy of GaN on Si

    SciTech Connect

    Armitage, Robert; Yang, Qing; Feick, Henning; Gebauer, Joerg; Weber, Eicke R.; Shinkai, Satoko; Sasaki, Katsutaka

    2002-05-08

    Gallium nitride is grown by plasma-assisted molecular-beam epitaxy on (111) and (001) silicon substrates using sputter-deposited hafnium nitride buffer layers. Wurtzite GaN epitaxial layers are obtained on both the (111) and (001) HfN/Si surfaces, with crack-free thickness up to 1.2 (mu)m. Initial results for GaN grown on the (111) surface show a photoluminescence peak width of 17 meV at 11 K, and an asymmetric x-ray rocking curve width of 20 arcmin. Wurtzite GaN on HfN/Si(001) shows reduced structural quality and peculiar low-temperature luminescence features. However, growth on the (001) surface results in nearly stress-free films, suggesting that much thicker crack-free layers could be obtained.

  11. Current isolating epitaxial buffer layers for high voltage photodiode array

    DOEpatents

    Morse, Jeffrey D.; Cooper, Gregory A.

    2002-01-01

    An array of photodiodes in series on a common semi-insulating substrate has a non-conductive buffer layer between the photodiodes and the semi-insulating substrate. The buffer layer reduces current injection leakage between the photodiodes of the array and allows optical energy to be converted to high voltage electrical energy.

  12. Evidence of deep traps in overgrown v-shaped defects in epitaxial GaN layers

    NASA Astrophysics Data System (ADS)

    Weidlich, P. H.; Schnedler, M.; Eisele, H.; Strauß, U.; Dunin-Borkowski, R. E.; Ebert, Ph.

    2013-08-01

    The geometric and electronic structure of overgrown v-shaped defects in GaN epitaxial layers are investigated by cross-sectional scanning tunneling microscopy and spectroscopy. The v-defects are found to be hexagonal pit structures delimited by six {112¯2} planes. The electronic properties are inhomogeneous. In some areas the center of the v-defects exhibits a strongly inhibited tunneling current, indicating the presence of deep traps.

  13. Pump-probe surface photovoltage spectroscopy measurements on semiconductor epitaxial layers

    SciTech Connect

    Jana, Dipankar Porwal, S.; Sharma, T. K. Oak, S. M.; Kumar, Shailendra

    2014-04-15

    Pump-probe Surface Photovoltage Spectroscopy (SPS) measurements are performed on semiconductor epitaxial layers. Here, an additional sub-bandgap cw pump laser beam is used in a conventional chopped light geometry SPS setup under the pump-probe configuration. The main role of pump laser beam is to saturate the sub-bandgap localized states whose contribution otherwise swamp the information related to the bandgap of material. It also affects the magnitude of Dember voltage in case of semi-insulating (SI) semiconductor substrates. Pump-probe SPS technique enables an accurate determination of the bandgap of semiconductor epitaxial layers even under the strong influence of localized sub-bandgap states. The pump beam is found to be very effective in suppressing the effect of surface/interface and bulk trap states. The overall magnitude of SPV signal is decided by the dependence of charge separation mechanisms on the intensity of the pump beam. On the contrary, an above bandgap cw pump laser can be used to distinguish the signatures of sub-bandgap states by suppressing the band edge related feature. Usefulness of the pump-probe SPS technique is established by unambiguously determining the bandgap of p-GaAs epitaxial layers grown on SI-GaAs substrates, SI-InP wafers, and p-GaN epilayers grown on Sapphire substrates.

  14. Surface morphological evolution during annealing of epitaxial Cu(001) layers

    SciTech Connect

    Purswani, J. M.; Gall, D.

    2008-08-15

    Single crystal Cu(001) layers were grown on MgO(001) by ultrahigh vacuum magnetron sputtering at T{sub s}=100 deg. C. Quantitative surface morphological analyses by in situ scanning tunneling microscopy show that the surfaces exhibit self-affine mound structures with a scaling exponent of 0.82{+-}0.03 and a mound radius r{sub c} that increases from 31{+-}8 to 39{+-}6 nm for increasing layer thickness t=24-120 nm. In situ annealing at 200 and 300 deg. C leads to a thermodynamically driven mass transport that minimizes the surface step density, resulting in broader mounds and a smaller root mean square surface roughness {sigma}. This effect is most pronounced for t=24 nm, for which r{sub c} increases from 31{+-}8 to 70{+-}20 nm and {sigma} decreases from 1.3{+-}0.1 to 0.74{+-}0.08 nm, resulting in a decrease in the average surface slope from {chi}=7 deg. to 2 deg. and an increase in the average terrace width w{sub T} by more than a factor of 4. In contrast, w{sub T} increases by only 20% for t=120 nm. This remarkable difference between 'thin' and 'thick' layers is attributed to diverging surface morphological pathways during annealing: The strong smoothening for t=24 nm is due to a competitive coalescence process where some mounds grow laterally at the expense of their smaller neighbors, which die out. In contrast, the initially wider mounds of thicker layers (t=120 nm) combine to form a quasistable surface morphology that exhibits anisotropic mound structures, which limit mass transport and stabilize the surface step density.

  15. The energetics of dislocation array stability in strained epitaxial layers

    NASA Astrophysics Data System (ADS)

    Gosling, T. J.; Willis, J. R.; Bullough, R.; Jain, S. C.

    1993-06-01

    Two aspects of the energetics of dislocation array stability in lattice-mismatched strained layers are addressed. The first concerns criteria for determining equilibrium dislocation distributions in strained layers; the second concerns the difference between the energies of arrays of dislocations in which the Burgers vectors of all dislocations are identical, and those in which the screw components of the Burgers vectors alternate. The conclusions reached are at variance with those of recent work by Feng and Hirth on periodic arrays of dipoles in an infinite body [X. Feng and J. P. Hirth, J. Appl. Phys. 72, 1386 (1992); J. P. Hirth and X. Feng, J. Appl. Phys. 67, 3343 (1990)]. In particular, it is emphasized that if layers remain in equilibrium then there is always a residual mean strain; in other words, the mismatch strain is never completely relaxed. Also it is shown, via a direct calculation, that although alternating the screw components of the Burgers vectors of dislocations within a single array is energetically favorable, it is preferable to have all screw components of the same sign within an array if two orthogonal arrays are considered. Although for comparison with the work of Feng and Hirth arrays of dipoles in an infinite body are considered in more detail, the stated conclusions are also shown to hold for arrays of unpaired dislocations near a free surface.

  16. Lateral epitaxial growth of two-dimensional layered semiconductor heterojunctions.

    PubMed

    Duan, Xidong; Wang, Chen; Shaw, Jonathan C; Cheng, Rui; Chen, Yu; Li, Honglai; Wu, Xueping; Tang, Ying; Zhang, Qinling; Pan, Anlian; Jiang, Jianhui; Yu, Ruqing; Huang, Yu; Duan, Xiangfeng

    2014-12-01

    Two-dimensional layered semiconductors such as MoS₂ and WSe₂ have attracted considerable interest in recent times. Exploring the full potential of these layered materials requires precise spatial modulation of their chemical composition and electronic properties to create well-defined heterostructures. Here, we report the growth of compositionally modulated MoS₂-MoSe₂ and WS₂-WSe₂ lateral heterostructures by in situ modulation of the vapour-phase reactants during growth of these two-dimensional crystals. Raman and photoluminescence mapping studies demonstrate that the resulting heterostructure nanosheets exhibit clear structural and optical modulation. Transmission electron microscopy and elemental mapping studies reveal a single crystalline structure with opposite modulation of sulphur and selenium distributions across the heterostructure interface. Electrical transport studies demonstrate that the WSe₂-WS₂ heterojunctions form lateral p-n diodes and photodiodes, and can be used to create complementary inverters with high voltage gain. Our study is an important advance in the development of layered semiconductor heterostructures, an essential step towards achieving functional electronics and optoelectronics.

  17. Impact of silicon epitaxial thickness layer in high power diode devices

    NASA Astrophysics Data System (ADS)

    Mee, Cheh Chai; Arshad, M. K. Md.; Hashim, U.; Fathil, M. F. M.

    2016-07-01

    The p-i-n diode is one of the earliest semiconductor devices developed for power circuit application. It is formed with the intrinsically doped i.e. i-layer sandwiched between the p-type and n-type layers. In this paper, we focus on the integration of the intrinsic region of silicon p-i-n diode to the current-voltage characteristics. In our structure, n-type refers to the bulk substrate and intrinsic region refers to the epitaxial layer of the silicon substrate. We make a thickness variation in the intrinsic region of p-i-n diode and how it affects diode performance. An additional layer is added on the epitaxial layer during the process to control the diffusion from the bottom of bulk substrate. Result shows that intrinsic layer optimization has successfully enhances the diode device robustness in terms of diode current-voltage characteristics, which reflects better manufacturing yield and improve the final product performance.

  18. Carrier Lifetime Measurement for Characterization of Ultraclean Thin p/p+ Silicon Epitaxial Layers

    NASA Astrophysics Data System (ADS)

    Elhami Khorasani, Arash

    Carrier lifetime is one of the few parameters which can give information about the low defect densities in today's semiconductors. In principle there is no lower limit to the defect density determined by lifetime measurements. No other technique can easily detect defect densities as low as 10 -9 - 10-10 cm-3 in a simple, contactless room temperature measurement. However in practice, recombination lifetime τ r measurements such as photoconductance decay (PCD) and surface photovoltage (SPV) that are widely used for characterization of bulk wafers face serious limitations when applied to thin epitaxial layers, where the layer thickness is smaller than the minority carrier diffusion length Ln. Other methods such as microwave photoconductance decay (µ-PCD), photoluminescence (PL), and frequency-dependent SPV, where the generated excess carriers are confined to the epitaxial layer width by using short excitation wavelengths, require complicated configuration and extensive surface passivation processes that make them time-consuming and not suitable for process screening purposes. Generation lifetime τg, typically measured with pulsed MOS capacitors (MOS-C) as test structures, has been shown to be an eminently suitable technique for characterization of thin epitaxial layers. It is for these reasons that the IC community, largely concerned with unipolar MOS devices, uses lifetime measurements as a "process cleanliness monitor." However when dealing with ultraclean epitaxial wafers, the classic MOS-C technique measures an effective generation lifetime τgeff which is dominated by the surface generation and hence cannot be used for screening impurity densities. I have developed a modified pulsed MOS technique for measuring generation lifetime in ultraclean thin p/p+ epitaxial layers which can be used to detect metallic impurities with densities as low as 10-10 cm-3. The widely used classic version has been shown to be unable to effectively detect such low impurity

  19. Characterization of AlGaN epitaxial layer

    NASA Astrophysics Data System (ADS)

    Parasuraman, Usha; Srinivasan, Sridhar; Ponce, Fernando; Rong, Liu; Abigail, Bell; Mei, Justin; Tanaka, S.

    2003-10-01

    Accurate aluminum compositions have been determined for AlxGa1-xN alloys whose rough compositions vary between 0layer. TEM pictures showed the absence of misfit dislocations in the basal plane which indicated that the AlGaN layer was indeed under pseudomorphic growth. This study allows us to conclude that RBS is not a suitable technique for estimating the composition in the case of light elements such as Al. Cathodoluminescence was done to determine the band gap and the bowing parameter was calculated for the composition range 0

  20. Atomic layer epitaxy of YBaCuO for optoelectronic applications

    NASA Technical Reports Server (NTRS)

    Skogman, R. A.; Khan, M. A.; Van Hove, J. M.; Bhattarai, A.; Boord, W. T.

    1992-01-01

    An MOCVD-based atomic-layer epitaxy process is being developed as a potential solution to the problems of film-thickness and interface-abruptness control which are encountered when fabricating superconductor-insulator-superconductor devices using YBa2Cu3O(7-x). In initial studies, the atomic-layer MOCVD process yields superconducting YBa2Cu3O(7-x) films with substrate temperatures of 605 C during film growth, and no postdeposition anneal. The low temperature process yields a smooth film surface and can reduce interface degradation due to diffusion.

  1. Single crystalline SiGe layers on Si by solid phase epitaxy

    NASA Astrophysics Data System (ADS)

    Lieten, R. R.; McCallum, J. C.; Johnson, B. C.

    2015-04-01

    We demonstrate a straightforward way to obtain single crystalline SiGe layers on silicon substrates. Amorphous SiGe layers, deposited by plasma enhanced chemical vapour deposition on Si, are transformed into single crystalline and smooth layers by solid phase epitaxy during annealing in a N2 atmosphere. The SiGe layers relax during the crystallization anneal and become slightly tensile strained during cooldown due to the thermal mismatch. The SiGe layers show excellent structural quality for compositions ranging from Ge- to Si-rich. The Ge content can be accurately estimated from the SiH4 to GeH4 flow ratio. Furthermore, the crystallization temperature decreases linearly with increasing Ge content from 725 °C for a-Si to 475 °C for a-Ge.

  2. Ferromagnetism and the electronic band structure in (Ga,Mn)(Bi,As) epitaxial layers

    NASA Astrophysics Data System (ADS)

    Yastrubchak, O.; Sadowski, J.; Gluba, L.; Domagala, J. Z.; Rawski, M.; Żuk, J.; Kulik, M.; Andrearczyk, T.; Wosinski, T.

    2014-08-01

    Impact of Bi incorporation into (Ga,Mn)As layers on their electronic- and band-structures as well as their magnetic and structural properties has been studied. Homogenous (Ga,Mn)(Bi,As) layers of high structural perfection have been grown by the low-temperature molecular-beam epitaxy technique. Post-growth annealing treatment of the layers results in an improvement of their structural and magnetic properties and an increase in the hole concentration in the layers. The modulation photoreflectance spectroscopy results are consistent with the valence-band model of hole-mediated ferromagnetism in the layers. This material combines the properties of (Ga,Mn)As and Ga(Bi,As) ternary compounds and offers the possibility of tuning its electrical and magnetic properties by controlling the alloy composition.

  3. Ferromagnetism and the electronic band structure in (Ga,Mn)(Bi,As) epitaxial layers

    SciTech Connect

    Yastrubchak, O.; Sadowski, J.; Domagala, J. Z.; Andrearczyk, T.; Wosinski, T.

    2014-08-18

    Impact of Bi incorporation into (Ga,Mn)As layers on their electronic- and band-structures as well as their magnetic and structural properties has been studied. Homogenous (Ga,Mn)(Bi,As) layers of high structural perfection have been grown by the low-temperature molecular-beam epitaxy technique. Post-growth annealing treatment of the layers results in an improvement of their structural and magnetic properties and an increase in the hole concentration in the layers. The modulation photoreflectance spectroscopy results are consistent with the valence-band model of hole-mediated ferromagnetism in the layers. This material combines the properties of (Ga,Mn)As and Ga(Bi,As) ternary compounds and offers the possibility of tuning its electrical and magnetic properties by controlling the alloy composition.

  4. Evaluation of methods for application of epitaxial layers of superconductor and buffer layers

    SciTech Connect

    1997-06-01

    The recent achievements in a number of laboratories of critical currents in excess of 1.0x10{sup 6} amp/cm{sup 2} at 77K in YBCO deposited over suitably textured buffer/substrate composites have stimulated interest in the potential applications of coated conductors at high temperatures and high magnetic fields. As of today, two different approaches for obtaining the textured substrates have been identified. These are: Los Alamos National Laboratory`s (LANL) ion-beam assisted deposition called IBAD, to obtain a highly textured yttria-stabilized zirconia (YSZ) buffer on nickel alloy strips, and Oak Ridge National Laboratory`s (ORNL) rolling assisted, bi-axial texturized substrate option called RABiTS. Similarly, based on the published literature, the available options to form High Temperature Superconductor (HTS) films on metallic, semi-metallic or ceramic substrates can be divided into: physical methods, and non-physical or chemical methods. Under these two major groups, the schemes being proposed consist of: - Sputtering - Electron-Beam Evaporation - Flash Evaporation - Molecular Beam Epitaxy - Laser Ablation - Electrophoresis - Chemical Vapor Deposition (Including Metal-Organic Chemical Vapor Deposition) - Sol-Gel - Metal-Organic Decomposition - Electrodeposition, and - Aerosol/Spray Pyrolysis. In general, a spool- to-spool or reel-to-reel type of continuous manufacturing scheme developed out of any of the above techniques, would consist of: - Preparation of Substrate Material - Preparation and Application of the Buffer Layer(s) - Preparation and Application of the HTS Material and Required Post-Annealing, and - Preparation and Application of the External Protective Layer. These operations would be affected by various process parameters which can be classified into: Chemistry and Material Related Parameters; and Engineering and Environmental Based Parameters. Thus, one can see that for successful development of the coated conductors manufacturing process, an

  5. Epitaxial Crystal Silicon Absorber Layers and Solar Cells Grown at 1.8 Microns per Minute

    SciTech Connect

    Bobela, D. C.; Teplin, C. W.; Young, D. L.; Branz, H. M.; Stradins, P.

    2011-01-01

    We have grown device-quality epitaxial silicon thin films at growth rates up to 1.85 {micro}m/min, using hot-wire chemical vapor deposition from silane, at substrate temperatures below 750 C. At these rates, which are more than 30 times faster than those used by the amorphous and nanocrystalline Si industry, capital costs for large-scale solar cell production would be dramatically reduced, even for cell absorber layers up to 10 {micro}m thick. We achieved high growth rates by optimizing the three key parameters: silane flow, depletion, and filament geometry, based on our model developed earlier. Hydrogen coverage of the filament surface likely limits silane decomposition and growth rate at high system pressures. No considerable deterioration in PV device performance is observed when grown at high rate, provided that the epitaxial growth is initiated at low rate. A simple mesa device structure (wafer/epi Si/a-Si(i)/a-Si:H(p)/ITO) with a 2.3 {micro}m thick epitaxial silicon absorber layer was grown at 0.7 {micro}m/min. The finished device had an open-circuit voltage of 0.424 V without hydrogenation treatment.

  6. Epitaxial Growth of Single Layer Blue Phosphorus: A New Phase of Two-Dimensional Phosphorus.

    PubMed

    Zhang, Jia Lin; Zhao, Songtao; Han, Cheng; Wang, Zhunzhun; Zhong, Shu; Sun, Shuo; Guo, Rui; Zhou, Xiong; Gu, Cheng Ding; Yuan, Kai Di; Li, Zhenyu; Chen, Wei

    2016-08-10

    Blue phosphorus, a previously unknown phase of phosphorus, has been recently predicted by theoretical calculations and shares its layered structure and high stability with black phosphorus, a rapidly rising two-dimensional material. Here, we report a molecular beam epitaxial growth of single layer blue phosphorus on Au(111) by using black phosphorus as precursor, through the combination of in situ low temperature scanning tunneling microscopy and density functional theory calculation. The structure of the as-grown single layer blue phosphorus on Au(111) is explained with a (4 × 4) blue phosphorus unit cell coinciding with a (5 × 5) Au(111) unit cell, and this is verified by the theoretical calculations. The electronic bandgap of single layer blue phosphorus on Au(111) is determined to be 1.10 eV by scanning tunneling spectroscopy measurement. The realization of epitaxial growth of large-scale and high quality atomic-layered blue phosphorus can enable the rapid development of novel electronic and optoelectronic devices based on this emerging two-dimensional material. PMID:27359041

  7. Epitaxial Growth of Single Layer Blue Phosphorus: A New Phase of Two-Dimensional Phosphorus.

    PubMed

    Zhang, Jia Lin; Zhao, Songtao; Han, Cheng; Wang, Zhunzhun; Zhong, Shu; Sun, Shuo; Guo, Rui; Zhou, Xiong; Gu, Cheng Ding; Yuan, Kai Di; Li, Zhenyu; Chen, Wei

    2016-08-10

    Blue phosphorus, a previously unknown phase of phosphorus, has been recently predicted by theoretical calculations and shares its layered structure and high stability with black phosphorus, a rapidly rising two-dimensional material. Here, we report a molecular beam epitaxial growth of single layer blue phosphorus on Au(111) by using black phosphorus as precursor, through the combination of in situ low temperature scanning tunneling microscopy and density functional theory calculation. The structure of the as-grown single layer blue phosphorus on Au(111) is explained with a (4 × 4) blue phosphorus unit cell coinciding with a (5 × 5) Au(111) unit cell, and this is verified by the theoretical calculations. The electronic bandgap of single layer blue phosphorus on Au(111) is determined to be 1.10 eV by scanning tunneling spectroscopy measurement. The realization of epitaxial growth of large-scale and high quality atomic-layered blue phosphorus can enable the rapid development of novel electronic and optoelectronic devices based on this emerging two-dimensional material.

  8. Layer matching epitaxy of NiO thin films on atomically stepped sapphire (0001) substrates

    PubMed Central

    Yamauchi, Ryosuke; Hamasaki, Yosuke; Shibuya, Takuto; Saito, Akira; Tsuchimine, Nobuo; Koyama, Koji; Matsuda, Akifumi; Yoshimoto, Mamoru

    2015-01-01

    Thin-film epitaxy is critical for investigating the original properties of materials. To obtain epitaxial films, careful consideration of the external conditions, i.e. single-crystal substrate, temperature, deposition pressure and fabrication method, is significantly important. In particular, selection of the single-crystal substrate is the first step towards fabrication of a high-quality film. Sapphire (single-crystalline α-Al2O3) is commonly used in industry as a thin-film crystal-growth substrate, and functional thin-film materials deposited on sapphire substrates have found industrial applications. However, while sapphire is a single crystal, two types of atomic planes exist in accordance with step height. Here we discuss the need to consider the lattice mismatch for each of the sapphire atomic layers. Furthermore, through cross-sectional transmission electron microscopy analysis, we demonstrate the uniepitaxial growth of cubic crystalline thin films on bistepped sapphire (0001) substrates. PMID:26402241

  9. Atomic layer deposition of epitaxial ZnO on GaN and YSZ

    NASA Astrophysics Data System (ADS)

    Lin, Chih-Wei; Ke, Dong-Jie; Chao, Yen-Cheng; Chang, Li; Liang, Mei-Hui; Ho, Yen-Teng

    2007-01-01

    ZnO thin films were epitaxially grown by atomic layer deposition on both of GaN/c-sapphire and yttria-stabilized zirconia (YSZ) substrates for comparison. X-ray diffraction, cross-sectional transmission electron microscopy (TEM) and photoluminescence (PL) measurements show that epitaxial ZnO films have better structural qualities and optical properties on GaN than on YSZ, whereas atomic force microscopy (AFM) shows that the surface of ZnO films on YSZ is smoother than on GaN. From the ZnO thickness measured by TEM, the growth rate of ZnO on GaN is about one (0 0 0 2) monolayer per cycle, which is roughly four times of that on YSZ.

  10. Magnetoabsorption in narrow-gap HgCdTe epitaxial layers in the terahertz range

    SciTech Connect

    Ikonnikov, A. V. Zholudev, M. S.; Gavrilenko, V. I.; Mikhailov, N. N.; Dvoretskii, S. A.

    2013-12-15

    The magnetoabsorption and photoconductivity spectra are investigated in the terahertz (THz) range at a temperature of T = 4.2 K for n-Hg{sub 1−x}Cd{sub x}Te bulk epitaxial layers of various compositions (both semiconductor and semimetallic) grown by molecular-beam epitaxy. Within the framework of the Kane 8 · 8 model, the electron and hole Landau levels are calculated. It is shown that, in contrast to the results of previous investigations, all observed resonance lines are related to transitions between the Landau levels of free carriers (the cyclotron resonance in the conduction band and the transitions between heavy-hole and electron Landau levels), which is evidence of the high purity and structural perfection of the samples. The possibility of using zero-gap Hg{sub 1−x}Cd{sub x}Te solid solutions as THz photodetectors tunable by magnetic field is shown.

  11. (abstract) All Epitaxial Edge-geometry SNS Devices with Doped PBCO and YBCO Normal Layers

    NASA Technical Reports Server (NTRS)

    Barner, J. B.; Hunt, B. D.; Foote, M. C.

    1995-01-01

    We will present our results on tapered-edge-geometry SNS weak link fabricated from c-axis oriented base-, counterelectrode and normal layers using a variety of processing conditions. To date, we have employed a variety of different normal materials (Co-doped YBCO, Y-doped PBCO, Ca-doped PBCO). We have been examining the junction fabrication process in detail and we will present our methods. In particular, we have been examining both epitaxial and non-epitaxial milling mask overlayers and we will present a comparison of both methods. These devices behave similar to the expectations of the resisively shunted junction model and conventional SNS proximity effect models but with some differences which will be discussed. We will present the detailed systematics of our junctions including device parameters versus temperature, rf and dc magnetic response for the various processing conditions.

  12. Thermal conductivity as a metric for the crystalline quality of SrTiO{sub 3} epitaxial layers

    SciTech Connect

    Oh, Dong-Wook; Ravichandran, Jayakanth; Liang, Chen-Wei; Martin, Lane W.; Cahill, David G.; Siemons, Wolter; Jalan, Bharat; Stemmer, Susanne; Brooks, Charles M.; Schlom, Darrell G.; Huijben, Mark; Majumdar, Arun; Ramesh, Ramamoorthy

    2011-05-30

    Measurements of thermal conductivity {Lambda} by time-domain thermoreflectance in the temperature range 100epitaxial layers of a prototypical oxide, SrTiO{sub 3}. Twenty samples from five institutions using two growth techniques, molecular beam epitaxy and pulsed laser deposition (PLD), were analyzed. Optimized growth conditions produce layers with {Lambda} comparable to bulk single crystals. Many PLD layers, particularly those that use ceramics as the target material, show surprisingly low {Lambda}. For homoepitaxial layers, the decrease in {Lambda} created by point defects correlates well with the expansion of the lattice parameter in the direction normal to the surface.

  13. Thermal conductivity as a metric for the crystalline quality of SrTiO3 epitaxial layers

    SciTech Connect

    Oh, Dong-Wook; Ravichandran, Jayakanth; Liang, Chen-Wei; Siemons, Wolter; Jalan, Bharat; Brooks, Charles M.; Huijben, Mark; Schlom, Darrell G.; Stemmer, Susanne; Martin, Lane W.; Majumdar, Arun; Ramesh, Ramamoorthy; Cahill, David G.

    2011-01-01

    Measurements of thermal conductivity Λ by time-domain thermoreflectance in the temperature range 100 < T < 300 K are used to characterize the crystalline quality of epitaxial layers of a prototypical oxide, SrTiO₃. Twenty samples from five institutions using two growth techniques, molecular beam epitaxy and pulsed laser deposition (PLD), were analyzed. Optimized growth conditions produce layers with Λ comparable to bulk single crystals. Many PLD layers, particularly those that use ceramics as the target material, show surprisingly low Λ. For homoepitaxial layers, the decrease in Λ created by point defects correlates well with the expansion of the lattice parameter in the direction normal to the surface.

  14. Controllable growth of layered selenide and telluride heterostructures and superlattices using molecular beam epitaxy

    DOE PAGES

    Vishwanath, Suresh; Liu, Xinyu; Rouvimov, Sergei; Basile, Leonardo; Lu, Ning; Azcatl, Angelica; Magno, Katrina; Wallace, Robert M.; Kim, Moon; Idrobo, Juan -Carlos; et al

    2016-01-06

    Layered materials are an actively pursued area of research for realizing highly scaled technologies involving both traditional device structures as well as new physics. Lately, non-equilibrium growth of 2D materials using molecular beam epitaxy (MBE) is gathering traction in the scientific community and here we aim to highlight one of its strengths, growth of abrupt heterostructures, and superlattices (SLs). In this work we present several of the firsts: first growth of MoTe2 by MBE, MoSe2 on Bi2Se3 SLs, transition metal dichalcogenide (TMD) SLs, and lateral junction between a quintuple atomic layer of Bi2Te3 and a triple atomic layer of MoTe2.more » In conclusion, reflected high electron energy diffraction oscillations presented during the growth of TMD SLs strengthen our claim that ultrathin heterostructures with monolayer layer control is within reach.« less

  15. Photoluminescence efficiency of BGaN epitaxial layers with high boron content

    NASA Astrophysics Data System (ADS)

    Jurkevičius, J.; Mickevičius, J.; Kadys, A.; Kolenda, M.; Tamulaitis, G.

    2016-07-01

    High-boron-content epitaxial layers of BGaN intended for lattice-matching with AlGaN in UV light emitters were grown on SiC substrate and GaN and AlN templates on sapphire. Photoluminescence (PL) of these layers was studied under quasi-steady-state conditions by varying temperature and excitation intensity. The PL spectra in the samples with different boron content and their dynamics evidence formation of boron-rich regions occupying a small fraction of the total layer volume and acting as the emission killers. The room-temperature PL efficiency of the BGaN epilayers was estimated and shown to drastically decrease at increasing boron content with no significant correlation with either the type of substrate/template or technological conditions of the layer deposition.

  16. Atomic layer deposition of perovskite oxides and their epitaxial integration with Si, Ge, and other semiconductors

    SciTech Connect

    McDaniel, Martin D.; Ngo, Thong Q.; Hu, Shen; Ekerdt, John G.; Posadas, Agham; Demkov, Alexander A.

    2015-12-15

    Atomic layer deposition (ALD) is a proven technique for the conformal deposition of oxide thin films with nanoscale thickness control. Most successful industrial applications have been with binary oxides, such as Al{sub 2}O{sub 3} and HfO{sub 2}. However, there has been much effort to deposit ternary oxides, such as perovskites (ABO{sub 3}), with desirable properties for advanced thin film applications. Distinct challenges are presented by the deposition of multi-component oxides using ALD. This review is intended to highlight the research of the many groups that have deposited perovskite oxides by ALD methods. Several commonalities between the studies are discussed. Special emphasis is put on precursor selection, deposition temperatures, and specific property performance (high-k, ferroelectric, ferromagnetic, etc.). Finally, the monolithic integration of perovskite oxides with semiconductors by ALD is reviewed. High-quality epitaxial growth of oxide thin films has traditionally been limited to physical vapor deposition techniques (e.g., molecular beam epitaxy). However, recent studies have demonstrated that epitaxial oxide thin films may be deposited on semiconductor substrates using ALD. This presents an exciting opportunity to integrate functional perovskite oxides for advanced semiconductor applications in a process that is economical and scalable.

  17. Structural and electrical properties of silicon epitaxial layers grown by LPE and CVD on identical polycrystalline substrates

    NASA Astrophysics Data System (ADS)

    Wagner, G.; Wawra, H.; Dorsch, W.; Albrecht, M.; Krome, R.; Strunk, H. P.; Riedel, S.; Möller, H. J.; Appel, W.

    1997-04-01

    We compare structural and electrical properties of polycrystalline Si layers grown by chemical vapour deposition (CVD) and liquid-phase epitaxy (LPE) on multicrystalline, cast silicon substrates with similar grain boundary structures. Time-resolved microwave conductivity shows a higher minority carrier lifetime in LPE than in CVD layers; the calculated diffusion lengths are up to three times the layer thickness for LPE-grown layers. After etching the samples in Secco or Sirtl solution, we measured in the p-type Si epitaxial LPE and CVD layers practically at the same dislocation density as in the same areas of the substrate. Electron-beam-induced current measurements reveal a low recombination strength of grain boundaries and dislocations in the LPE-grown layers compared to those of the CVD layers. Transmission electron microscope investigations indicate that the lower recombination strength at the grain boundaries of the LPE layers is due to a lower density of grain boundary dislocations.

  18. Current-driven morphological evolution of single-layer epitaxial islands on crystalline substrates

    NASA Astrophysics Data System (ADS)

    Dasgupta, Dwaipayan; Sfyris, Georgios I.; Maroudas, Dimitrios

    2013-12-01

    We develop and validate a nonlinear model for the current-driven dynamics of single-layer epitaxial islands on crystalline substrates. Simulations based on the model show that the dependence of the stable steady island migration speed vm on the inverse of the island size is not linear for larger-than-critical island sizes. In this nonlinear regime, we report morphological transitions, Hopf bifurcations, and instabilities for various surface crystallographic orientations and island misfit strains. Proper rescaling of vm gives a universal linear relationship for its dependence on island size.

  19. Meandering of overgrown v-shaped defects in epitaxial GaN layers

    NASA Astrophysics Data System (ADS)

    Weidlich, P. H.; Schnedler, M.; Portz, V.; Eisele, H.; Dunin-Borkowski, R. E.; Ebert, Ph.

    2014-07-01

    The meandering of v-shaped defects in GaN(0001) epitaxial layers is investigated by cross-sectional scanning tunneling microscopy. The spatial position of v-shaped defects is mapped on ( 10 1 ¯ 0 ) cleavage planes using a dopant modulation, which traces the overgrown growth front. Strong lateral displacements of the apex of the v-shaped defects are observed. The lateral displacements are suggested to be induced by the meandering of threading dislocations present in the v-shaped defects. The meandering of the dislocation is attributed to interactions with inhomogeneous strain fields.

  20. Repulsive interactions between dislocations and overgrown v-shaped defects in epitaxial GaN layers

    NASA Astrophysics Data System (ADS)

    Weidlich, P. H.; Schnedler, M.; Eisele, H.; Dunin-Borkowski, R. E.; Ebert, Ph.

    2013-09-01

    The spatial distribution and the projected line directions of dislocations intersecting a cross-sectional (101¯0) cleavage plane of a GaN(0001) epitaxial layer is mapped using scanning tunneling microscopy. The data is correlated with the spatial positions of v-shaped defects. The dislocations are found to be bent away from the inclined semipolar facets of v-shaped defects, due to a strain-induced repulsive interaction. The dislocation distribution is characterized by agglomerations and intersecting bundles of dislocations with parallel projected line directions, stabilized by many body effects in the repulsive strain interactions.

  1. Effect of reactive ion beam etching on the photoluminescence of CdTe epitaxial layers

    SciTech Connect

    Martinez-Pastor, J.; Fuster, D.; Abellan, M.; Anguita, J.; Sochinskii, N. V.

    2008-03-01

    We demonstrated the effect of reactive ion beam etching (RIBE) process on the PL properties of CdTe/sapphire metal organic vapor phase epitaxy layers. At optimum conditions, the RIBE attack does not make significant morphological changes but it results in an increase of the concentration of acceptor impurities. This was revealed by an increase of the overall photoluminescence (PL) intensity and, simultaneously, a decrease of the PL decay time, more important on the low energy side of PL spectrum due to the recombination of carriers in acceptor pairs.

  2. Terahertz absorption in GaN epitaxial layers under lateral electric field

    NASA Astrophysics Data System (ADS)

    Balagula, R. M.; Vinnichenko, M. Ya; Melentev, G. A.; Moldavskaya, M. D.; Shalygin, V. A.; Vorobjev, L. E.; Firsov, D. A.; Danilov, S. N.; Suihkonen, S.

    2016-08-01

    Variation of absorption of terahertz radiation in lateral electric field was investigated in GaN epitaxial layers. Different behaviour of the absorption modulation in electric field was observed for radiation polarized along electric field and perpendicular to it. Joint analysis of optical and transport measurements let us obtain field dependencies of mobility, electron concentration and absorption cross-section. For terahertz radiation polarized perpendicular to the electric field, results are in accordance with Drude model of free electron absorption. Another polarization demonstrates significant deviation that is yet to be studied more thoroughly.

  3. Towards precise defect control in layered oxide structures by using oxide molecular beam epitaxy

    PubMed Central

    Baiutti, Federico; Christiani, Georg

    2014-01-01

    Summary In this paper we present the atomic-layer-by-layer oxide molecular beam epitaxy (ALL-oxide MBE) which has been recently installed in the Max-Planck Institute for Solid State Research and we report on its present status, providing some examples that demonstrate its successful application in the synthesis of different layered oxides, with particular reference to superconducting La2CuO4 and insulator-to-metal La2− xSrxNiO4. We briefly review the ALL-oxide MBE technique and its unique capabilities in the deposition of atomically smooth single-crystal thin films of various complex oxides, artificial compounds and heterostructures, introducing our goal of pursuing a deep investigation of such systems with particular emphasis on structural defects, with the aim of tailoring their functional properties by precise defects control. PMID:24995148

  4. Growth and characterization of epitaxial aluminum layers on gallium-arsenide substrates for superconducting quantum bits

    NASA Astrophysics Data System (ADS)

    Tournet, J.; Gosselink, D.; Miao, G.-X.; Jaikissoon, M.; Langenberg, D.; McConkey, T. G.; Mariantoni, M.; Wasilewski, Z. R.

    2016-06-01

    The quest for a universal quantum computer has renewed interest in the growth of superconducting materials on semiconductor substrates. High-quality superconducting thin films will make it possible to improve the coherence time of superconducting quantum bits (qubits), i.e., to extend the time a qubit can store the amplitude and phase of a quantum state. The electrical losses in superconducting qubits highly depend on the quality of the metal layers the qubits are made from. Here, we report on the epitaxy of single-crystal Al (011) layers on GaAs (001) substrates. Layers with 110 nm thickness were deposited by means of molecular beam epitaxy at low temperature and monitored by in situ reflection high-energy electron diffraction performed simultaneously at four azimuths. The single-crystal nature of the layers was confirmed by ex situ high-resolution x-ray diffraction. Differential interference contrast and atomic force microscopy analysis of the sample’s surface revealed a featureless surface with root mean square roughness of 0.55 nm. A detailed in situ study allowed us to gain insight into the nucleation mechanisms of Al layers on GaAs, highlighting the importance of GaAs surface reconstruction in determining the final Al layer crystallographic orientation and quality. A highly uniform and stable GaAs (001)-(2× 4) reconstruction reproducibly led to a pure Al (011) phase, while an arsenic-rich GaAs (001)-(4× 4) reconstruction yielded polycrystalline films with an Al (111) dominant orientation. The near-atomic smoothness and single-crystal character of Al films on GaAs, in combination with the ability to trench GaAs substrates, could set a new standard for the fabrication of superconducting qubits.

  5. Static atomic displacements in a CdTe epitaxial layer on a GaAs substrate

    NASA Astrophysics Data System (ADS)

    Horning, R. D.; Staudenmann, J.-L.

    1987-05-01

    A (001)CdTe epitaxial layer on a (001)GaAs substrate was studied by x-ray diffraction between 10 and 360 K. The CdTe growth took place at 380 °C in a vertical gas flow metalorganic chemical vapor deposition reactor. Lattice parameters and integrated intensities of both the substrate and the epitaxial layer using the (00l) and (hhh) Bragg reflections reveal three important features. Firstly, the GaAs substrate does not exhibit severe strain after deposition and it is as perfect as a bulk GaAs. Secondly, the CdTe unit cell distorts tetragonally with a⊥>a∥ below 300 K. The decay of the (00l) reflection intensities as a function of the temperature yields a Debye temperature of 142 K, the same value as for bulk CdTe. Thirdly, a temperature-dependent isotropic static displacement of the Cd and the Te atoms is introduced to account for the anomalous behavior of the (hhh) intensities.

  6. Columnar structured FePt films epitaxially grown on large lattice mismatched intermediate layer

    PubMed Central

    Dong, K. F.; Deng, J. Y.; Peng, Y. G.; Ju, G.; Chow, G. M.; Chen, J. S.

    2016-01-01

    The microstructure and magnetic properties of the FePt films grown on large mismatched ZrN (15.7%) intermediate layer were investigated. With using ZrN intermediate layer, FePt 10 nm films exhibited (001) texture except for some weaker FePt (110) texture. Good epitaxial relationships of FePt (001) <100>//ZrN (001) <100>//TiN (001) <100> among FePt and ZrN/TiN were revealed from the transmission electron microscopy (TEM) results. As compared with TiN intermediate layer, although FePt-SiO2-C films grown on ZrN/TiN intermediate layer showed isotropic magnetic properties, the large interfacial energy and lattice mismatch between FePt and ZrN would lead to form columnar structural FePt films with smaller grain size and improved isolation. By doping ZrN into the TiN layer, solid solution of ZrTiN was formed and the lattice constant is increased comparing with TiN and decreased comparing with ZrN. Moreover, FePt-SiO2-C films grown on TiN 2 nm-20 vol.% ZrN/TiN 3 nm intermediate layer showed an improved perpendicular magnetic anisotropy. Simultaneously, columnar structure with smaller grain size retained. PMID:27686046

  7. Few layer epitaxial germanene: a novel two-dimensional Dirac material.

    PubMed

    Dávila, María Eugenia; Le Lay, Guy

    2016-01-01

    Monolayer germanene, a novel graphene-like germanium allotrope akin to silicene has been recently grown on metallic substrates. Lying directly on the metal surfaces the reconstructed atom-thin sheets are prone to lose the massless Dirac fermion character and unique associated physical properties of free standing germanene. Here, we show that few layer germanene, which we create by dry epitaxy on a gold template, possesses Dirac cones thanks to a reduced interaction. This finding established on synchrotron-radiation-based photoemission, scanning tunneling microscopy imaging and surface electron diffraction places few layer germanene among the rare two-dimensional Dirac materials. Since germanium is currently used in the mainstream Si-based electronics, perspectives of using germanene for scaling down beyond the 5 nm node appear very promising. Other fascinating properties seem at hand, typically the robust quantum spin Hall effect for applications in spintronics and the engineering of Floquet Majorana fermions by light for quantum computing.

  8. Raman scattering of Zn doped CuGaS2 layers grown by vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Terasako, T.; Iida, S.; Ichinokura, H.; Kato, A.

    2005-11-01

    Raman spectra for non-site-selectively and site-selectively Zn-doped CuGaS2 layers grown by vapor phase epitaxy (VPE) were investigated. Although an appearance of characteristic Raman line(s) related with the doped Zn atom was not seen, an enhancement of the Raman intensity ratio of the highest LO mode to the A1 mode (ILO/IA1) was observed. The site-selectively Zn-doped layers with p-type conductivity exhibited larger ILO/IA1 ratio compared to those with n-type conductivity. The observed correlation between the ILO/IA1 ratio and the peak energy of the photoluminescence characteristic for Zn-doped p-type samples (L emission) suggests that the enhancement of ILO/IA1 is due to the increase of Zn atom substituting Ga site (ZnGa) which is acting as an acceptor.

  9. Few layer epitaxial germanene: a novel two-dimensional Dirac material.

    PubMed

    Dávila, María Eugenia; Le Lay, Guy

    2016-01-01

    Monolayer germanene, a novel graphene-like germanium allotrope akin to silicene has been recently grown on metallic substrates. Lying directly on the metal surfaces the reconstructed atom-thin sheets are prone to lose the massless Dirac fermion character and unique associated physical properties of free standing germanene. Here, we show that few layer germanene, which we create by dry epitaxy on a gold template, possesses Dirac cones thanks to a reduced interaction. This finding established on synchrotron-radiation-based photoemission, scanning tunneling microscopy imaging and surface electron diffraction places few layer germanene among the rare two-dimensional Dirac materials. Since germanium is currently used in the mainstream Si-based electronics, perspectives of using germanene for scaling down beyond the 5 nm node appear very promising. Other fascinating properties seem at hand, typically the robust quantum spin Hall effect for applications in spintronics and the engineering of Floquet Majorana fermions by light for quantum computing. PMID:26860590

  10. Few layer epitaxial germanene: a novel two-dimensional Dirac material

    PubMed Central

    Dávila, María Eugenia; Le Lay, Guy

    2016-01-01

    Monolayer germanene, a novel graphene-like germanium allotrope akin to silicene has been recently grown on metallic substrates. Lying directly on the metal surfaces the reconstructed atom-thin sheets are prone to lose the massless Dirac fermion character and unique associated physical properties of free standing germanene. Here, we show that few layer germanene, which we create by dry epitaxy on a gold template, possesses Dirac cones thanks to a reduced interaction. This finding established on synchrotron-radiation-based photoemission, scanning tunneling microscopy imaging and surface electron diffraction places few layer germanene among the rare two-dimensional Dirac materials. Since germanium is currently used in the mainstream Si-based electronics, perspectives of using germanene for scaling down beyond the 5 nm node appear very promising. Other fascinating properties seem at hand, typically the robust quantum spin Hall effect for applications in spintronics and the engineering of Floquet Majorana fermions by light for quantum computing. PMID:26860590

  11. Growth and characterization of GaAs layers on Si substrates by migration-enhanced molecular beam epitaxy

    NASA Technical Reports Server (NTRS)

    Kim, Jae-Hoon; Liu, John K.; Radhakrishnan, Gouri; Katz, Joseph; Sakai, Shiro

    1988-01-01

    Migration-enhanced molecular beam epitaxial (MEMBE) growth and characterization of the GaAs layer on Si substrates (GaAs/Si) are reported. The MEMBE growth method is described, and material properties are compared with those of normal two-step MBE-grown or in situ annealed layers. Micrographs of cross-section view transmission electron microscopy and scanning surface electron microscopy of MEMBE-grown GaAs/Si showed dislocation densities of 10 to the 7th/sq cm. AlGaAs/GaAs double heterostructures have been successfully grown on MEMBE GaAs/Si by both metalorganic chemical vapor deposition and liquid phase epitaxy.

  12. Influence of multi wafer annealing of LEC GaAs substrates on the quality of epitaxial layers

    SciTech Connect

    Forker, J.; Baeumler, M.; Weyher, J.L.; Jantz, W.

    1996-12-01

    The lateral distribution of dislocations and nonradiative recombination centers in bulk LEC GaAs is reproduced in the epilayer. Combined ingot/multi wafer annealing reduces the excess As concentration at dislocations and generates As matrix precipitates. We find that the presence of matrix precipitates does not adversely affect the epitaxial layer quality. On the other hand layer defects correlated with substrate dislocations are still visible. Hence either the ingot/wafer annealing does not sufficiently reduce dislocation-correlated substrate defects migrating into the epilayer. Alternatively, nonradiative recombination centers are generated during epitaxial growth near dislocations propagating from the substrate into the epilayer.

  13. Planarization and Processing of Metamorphic Buffer Layers Grown by Hydride Vapor-Phase Epitaxy

    NASA Astrophysics Data System (ADS)

    Zutter, Brian T.; Schulte, Kevin L.; Kim, Tae Wan; Mawst, Luke J.; Kuech, T. F.; Foran, Brendan; Sin, Yongkun

    2014-04-01

    Hydride vapor-phase epitaxy (HVPE) is a high-growth-rate, cost-effective means to grow epitaxial semiconductor material. Thick HVPE-based metamorphic buffer layers (MBLs) can serve as "pseudosubstrates" with controllable lattice parameter. In our structures, the indium content in In x Ga1- x As is gradually increased from zero to the final composition corresponding to the desired lattice constant, and then a thick (˜10 μm) constant-composition capping layer is grown. This thick capping layer promotes maximum strain relaxation while permitting use of polishing procedures to achieve surface planarity. Lattice-mismatched growth of MBLs invariably results in rough, cross-hatched surface morphology exhibiting up to 200 nm peak-to-valley roughness. This roughness can be eliminated by chemical mechanical planarization, thus creating a suitable surface for subsequent regrowth. Polishing of In x Ga1- x As is complicated by the sensitivity of the surface layer to the polishing parameters, particularly the applied pressure. Polishing at high applied pressure (12 psi) results in the formation of circular asperities hundreds of nanometers high and tens of microns in diameter. When lower applied pressure (4 psi) was used, the cross-hatching height of MBLs was lowered from 200 nm to <10 nm over a 350 μm lateral scale. The successfully planarized In0.20Ga0.80As MBLs were used as a substrate for a superlattice (SL) structure such as that used in quantum cascade lasers. Use of planarization before regrowth of the SL resulted in a reduction of the high-resolution x-ray diffraction peak full-width at half-maximum from 389″ to 159″.

  14. Epitaxial 1D electron transport layers for high-performance perovskite solar cells

    NASA Astrophysics Data System (ADS)

    Han, Gill Sang; Chung, Hyun Suk; Kim, Dong Hoe; Kim, Byeong Jo; Lee, Jin-Wook; Park, Nam-Gyu; Cho, In Sun; Lee, Jung-Kun; Lee, Sangwook; Jung, Hyun Suk

    2015-09-01

    We demonstrate high-performance perovskite solar cells with excellent electron transport properties using a one-dimensional (1D) electron transport layer (ETL). The 1D array-based ETL is comprised of 1D SnO2 nanowires (NWs) array grown on a F:SnO2 transparent conducting oxide substrate and rutile TiO2 nanoshells epitaxially grown on the surface of the 1D SnO2 NWs. The optimized devices show more than 95% internal quantum yield at 750 nm, and a power conversion efficiency (PCE) of 14.2%. The high quantum yield is attributed to dramatically enhanced electron transport in the epitaxial TiO2 layer, compared to that in conventional nanoparticle-based mesoporous TiO2 (mp-TiO2) layers. In addition, the open space in the 1D array-based ETL increases the prevalence of uniform TiO2/perovskite junctions, leading to reproducible device performance with a high fill factor. This work offers a method to achieve reproducible, high-efficiency perovskite solar cells with high-speed electron transport.We demonstrate high-performance perovskite solar cells with excellent electron transport properties using a one-dimensional (1D) electron transport layer (ETL). The 1D array-based ETL is comprised of 1D SnO2 nanowires (NWs) array grown on a F:SnO2 transparent conducting oxide substrate and rutile TiO2 nanoshells epitaxially grown on the surface of the 1D SnO2 NWs. The optimized devices show more than 95% internal quantum yield at 750 nm, and a power conversion efficiency (PCE) of 14.2%. The high quantum yield is attributed to dramatically enhanced electron transport in the epitaxial TiO2 layer, compared to that in conventional nanoparticle-based mesoporous TiO2 (mp-TiO2) layers. In addition, the open space in the 1D array-based ETL increases the prevalence of uniform TiO2/perovskite junctions, leading to reproducible device performance with a high fill factor. This work offers a method to achieve reproducible, high-efficiency perovskite solar cells with high-speed electron transport

  15. Multiple Layer BeSeTe/Si Heteroepitaxial Growth on Vicinal Si (100) Surfaces by Molecular Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Maldonado, Eduardo; Clark, Kevin; Basit, Nasir; Sandu, Titus; Bate, Robert; Kirk, Wiley

    2003-03-01

    The epitaxial growth of multiple layers of BeSeTe/Si films on arsenic passivated vicinal Si (100) substrates is reported. These are interesting wide bandgap heterostructures that are lattice matched to silicon. Reflection high-energy electron diffraction (RHEED) was used to investigate the entire growth regime and to optimize the initial growth conditions, which is important for reducing interface defects. Atomic layer epitaxy (ALE) was used as a growth method. Transmission electron microscopy (TEM) showed epitaxial growth with no crystal defects. Residual gas analyzer (RGA) was used for desorption studies and helped to determine that chemical interactions between VI-group and Si limit the interface quality. Rutherford backscattering spectroscopy (RBS) corroborate the lattice match between BeSe_0.41Te_0.59 and Si.

  16. Reuse of GaAs substrates for epitaxial lift-off by employing protection layers

    NASA Astrophysics Data System (ADS)

    Lee, Kyusang; Zimmerman, Jeramy D.; Xiao, Xin; Sun, Kai; Forrest, Stephen R.

    2012-02-01

    We demonstrate repeated use of GaAs wafers for multiple growths by employing lattice-matched epitaxial protection layers to preserve the wafer surface in its original condition following their etch removal after growth. The protection layers provide a regrowth surface that eliminates the need for repolishing prior to subsequent growth. Between growths, the protection layers are removed by wet chemical etching. The resulting surface quality is examined using atomic force microscope and energy dispersive spectrometry. We show that the surface roughness, chemical composition, morphology, and electronic properties of the GaAs surface after protection-layer removal are comparable to that of the original substrate surface. We show that p-n junction GaAs solar cells grown on original and reused wafers have nearly identical performance with power conversion efficiencies of ˜23%, under simulated 1 sun illumination, AM1.5 G. The high power conversion efficiency of GaAs solar cells combined with reduced costs associated with multiple parent wafer reuses promise cost competitiveness with incumbent solar cell technologies.

  17. Effect of As Passivation on Vapor-Phase Epitaxial Growth of Ge on (211)Si as a Buffer Layer for CdTe Epitaxy

    NASA Astrophysics Data System (ADS)

    Shintri, Shashidhar; Rao, Sunil; Sarney, Wendy; Garg, Saurabh; Palosz, Witold; Trivedi, Sudhir; Wijewarnasuriya, Priyalal; Bhat, Ishwara

    2011-08-01

    We report an investigation of epitaxial germanium grown by chemical vapor deposition (CVD) on arsenic-terminated (211)Si, which is the preferred substrate in the USA for fabrication of night-vision devices based on mercury cadmium telluride (MCT) grown by molecular-beam epitaxy (MBE). The films were characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM), cross-sectional transmission electron microscopy (XTEM), and x-ray diffraction (XRD). Arsenic passivation was found to be effective in preventing cross-contamination of unwanted residual species present inside the reactor chamber and also in prolonging the evolution of layer-by-layer growth of Ge for significantly more monolayers than on nonpassivated Si. The two-dimensional (2D) to three-dimensional (3D) transition resulted in Ge islands, the density and morphology of which showed a clear distinction between passivated and nonpassivated (211)Si. Finally, thick Ge layers (˜250 nm) were grown at 525°C and 675°C with and without As passivation, where the layers grown with As passivation resulted in higher crystal quality and smooth surface morphology.

  18. Atomic layer deposition of metastable β-Fe₂O₃ via isomorphic epitaxy for photoassisted water oxidation.

    PubMed

    Emery, Jonathan D; Schlepütz, Christian M; Guo, Peijun; Riha, Shannon C; Chang, Robert P H; Martinson, Alex B F

    2014-12-24

    We report the growth and photoelectrochemical (PEC) characterization of the uncommon bibyite phase of iron(III) oxide (β-Fe2O3) epitaxially stabilized via atomic layer deposition on an conductive, transparent, and isomorphic template (Sn-doped In2O3). As a photoanode, unoptimized β-Fe2O3 ultrathin films perform similarly to their ubiquitous α-phase (hematite) counterpart, but reveal a more ideal bandgap (1.8 eV), a ∼0.1 V improved photocurrent onset potential, and longer wavelength (>600 nm) spectral response. Stable operation under basic water oxidation justifies further exploration of this atypical phase and motivates the investigation of other unexplored metastable phases as new PEC materials.

  19. Evaluation of MOS structures processed on 4H SiC layers grown by PVT epitaxy

    NASA Astrophysics Data System (ADS)

    Ciechonski, R. R.; Syväjärvi, M.; Wahab, Q.; Yakimova, R.

    2005-12-01

    MOS capacitors have been fabricated on 4H-SiC epilayers grown by physical vapor transport (PVT) epitaxy. The properties were compared with those on similar structures based on chemical vapor deposition (CVD) layers. Capacitance-voltage ( C- V) and conductance measurements ( G- V) were performed in the frequency range of 1 kHz to 1 MHz and also at temperatures up to 475 K. Detailed investigations of the PVT structures indicate a stable behaviour of the interface traps from room temperature up to 475 K. The amount of positive oxide charge QO is 6.83 × 10 9 cm -2 at room temperature and decreases with temperature increase. This suggests that the processed devices are temperature stable. The density of interface states Dit obtained by Nicollian-Brews conductance method is lower in the structure based on the PVT grown sample.

  20. Study of atomic layer epitaxy of zinc oxide by in-situ quartz crystal microgravimetry

    NASA Astrophysics Data System (ADS)

    Yousfi, El Bekkaye; Fouache, Jacques; Lincot, Daniel

    2000-01-01

    The deposition of ZnO thin films by atomic layer epitaxy (ALE) from diethylzinc and water precursors is studied for the first time by an in-situ quartz crystal microbalance technique. Quantitative measurement of the growth with a resolution down to the monolayer level is demonstrated. Influence of temperature, pulse lengths and substrate characteristics has been studied. The site saturation regime (ALE window) is between 100°C and 160°C and corresponds to the growth of one (100) monolayer with possible effects of roughness and surface reconstruction. Effect of nucleation and coalescence has been clearly evidenced both on foreign substrates and more surprisingly on ZnO substrates depending of the duration of the rest period. The analysis of the mass variation during individual cycles raises some questions about the growth mechanism.

  1. Observation of anisotropic distribution of microstructure in GaP/GaAs epitaxial layers

    NASA Astrophysics Data System (ADS)

    Kumar, Ravi; Dixit, V. K.; Ganguli, Tapas; Mukherjee, C.; Srivastava, A. K.; Sharma, T. K.

    2016-10-01

    Anisotropic distribution of microstructure in GaP/GaAs epitaxial layers is investigated by performing high resolution x-ray diffraction (HRXRD) experiments for symmetric reflections at different azimuths. The observed anisotropy leads to the different values of lattice relaxation along the [ 01 1 ¯ ] and [ 0 1 ¯ 1 ¯ ] directions as revealed by the reciprocal space maps recorded at 0° and 90° azimuths for ( 4 2 ¯ 2 ¯ ) and ( 42 2 ¯ ) reflections. The anisotropic relaxation process causes large differences in the full width at half maximum of (400) diffraction peaks of omega scans along the [ 01 1 ¯ ] and [ 0 1 ¯ 1 ¯ ] directions. It therefore provides large differences in the values of microstructural parameters of the GaP epitaxial layer along the two in-plane orthogonal directions. A systematic Williamson-Hall analysis of HRXRD data confirms the presence of large anisotropy of lattice relaxation process along the [ 01 1 ¯ ] and [ 0 1 ¯ 1 ¯ ] directions. Due to the large lattice mismatch, the GaP/GaAs epilayer presented here possesses grain boundaries and the broadening of the HRXRD pattern is strongly affected by the anisotropy of microstructure and dislocations. The kinetics of dislocations is discussed where it is observed that the misfit strain is primarily relieved by 90° partial dislocations up to a certain thickness of epilayer and thereafter the nucleation of 60° perfect dislocations dominates the strain relaxation process. The effect of the anisotropic distribution of relaxation process is also seen in the surface topography of GaP epilayer as revealed by atomic force microscopy images. The origin of the anisotropic distribution of dislocations is explained by considering the Burgers vector network, and its consequences are also observed in the cross sectional transmission electron microscopy images.

  2. Deep level transient spectroscopy assessment of silicon contamination in AlGaAs layers grown by metalorganic vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Calleja, E.; Sanchez, F.; Muñoz, E.; Gibart, P.; Powell, A.; Roberts, J. S.

    1995-08-01

    A systematic silicon contamination has been detected by deep level transient spectroscopy in undoped and n-type doped (Te, Se, Sn) AlGaAs layers, grown in two different metalorganic vapor phase epitaxy reactors. DX center generation by substitutional donors, with very specific capture and emission thermal barriers (fingerprints), is the key to unambiguously identifying their presence, with detection limits well below the standard secondary ion mass spectroscopy capability. We comment on the potential sources of Si contamination (most common in this epitaxial technique), and on the relevance of such contamination to interpreting correctly experimental data related to the microscopic structure of DX centers.

  3. The structure and photoconductivity of SiGe/Si epitaxial layers modified by single-pulse laser radiation

    NASA Astrophysics Data System (ADS)

    Ivlev, G. D.; Kazuchits, N. M.; Prakopyeu, S. L.; Rusetsky, M. S.; Gaiduk, P. I.

    2014-12-01

    The effect of nanosecond pulses of ruby laser radiation on the structural state and morphology of the epitaxial layers of a SiO0.5Ge0.5 solid solution on silicon with the initiation of a crystal-melt phase transition has been studied by electron microscopy. Data on the photoelectric parameters of the laser-modified layers having a cellular structure owing to the segregation of germanium during the solidification of the binary melt have been derived.

  4. Three-wave diffraction in damaged epitaxial layers with a wurtzite structure

    NASA Astrophysics Data System (ADS)

    Kyutt, R. N.

    2011-05-01

    Three-wave diffraction of X-rays is measured using the Renninger scheme for a series of GaN epitaxial layers of various thicknesses and degrees of structural perfection. In each 30°-angular interval of azimuthal rotation, all ten three-wave peaks determined by the geometry of diffraction with the 0001 first forbidden reflection and Cu K α radiation are observed. The φ- and θ-scanned diffraction curves are measured for each three-wave combination. The angular FWHM of the diffraction peaks formed in experiments and its relation with the parameters of the two-wave diffraction pattern and the dislocation structure of the layers are analyzed. It is shown that the φ-scan peaks are less sensitive to the degree of structural perfection than the γ-mode peaks. The strongest dependence on the dislocation density for the latter peaks is observed for the (1bar 100)/(bar 1101) and (3bar 2bar 10)/(bar 3211) three-wave combinations with a pure Laue component of secondary radiation, while the (01bar 13)/(0bar 11bar 2) combination with a large Bragg component exhibits the weakest dependence. Splitting of three-wave Renninger peaks associated with the coarse-block structure of some of the layers with rotations of the blocks about the normal to the surface is detected. The total integrated intensity of all three-wave combinations is determined and their ratios are in qualitative agreement with the theory.

  5. Epitaxial-strain-induced polar-to-nonpolar transitions in layered oxides

    NASA Astrophysics Data System (ADS)

    Lu, Xue-Zeng; Rondinelli, James M.

    2016-09-01

    Epitaxial strain can induce collective phenomena and new functionalities in complex oxide thin films. Strong coupling between strain and polar lattice modes can stabilize new ferroelectric phases from nonpolar dielectrics or enhance electric polarizations and Curie temperatures. Recently, strain has also been exploited to induce novel metal-insulator transitions and magnetic reconstructions through its coupling to nonpolar modes, including rotations of BO6 transition-metal octahedra. Although large strains are thought to induce ferroelectricity, here we demonstrate a polar-to-nonpolar transition in (001) films of layered A3B2O7 hybrid-improper ferroelectrics with experimentally accessible biaxial strains. We show the origin of the transition originates from the interplay of trilinear-related lattice mode interactions active in the layered oxides, and those interactions are directly strain tunable. Our results call for a careful re-examination of the role of strain-polarization coupling in ferroelectric films with nontrivial anharmonicities and offer a route to search for new functionalities in layered oxides.

  6. Atomic Layers: Tellurium-Assisted Epitaxial Growth of Large-Area, Highly Crystalline ReS2 Atomic Layers on Mica Substrate (Adv. Mater. 25/2016).

    PubMed

    Cui, Fangfang; Wang, Cong; Li, Xiaobo; Wang, Gang; Liu, Kaiqiang; Yang, Zhou; Feng, Qingliang; Liang, Xing; Zhang, Zhongyue; Liu, Shengzhong; Lei, Zhibin; Liu, Zonghuai; Xu, Hua; Zhang, Jin

    2016-07-01

    H. Xu, J. Zhang, and co-workers synthesize anisotropic 2D-layered rhenium disulfide with high crystal quality and uniform monolayer thickness. As described on page 5019, tellurium-assisted epitaxial growth on a mica substrate is chosen to generate such structures. PMID:27372721

  7. Nucleation and coalescence behavior for epitaxial ZnO layers on ZnO/sapphire templates grown by halide vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Fujii, Tetsuo; Yoshii, Naoki; Masuda, Rui; Tanabe, Tetsuhiro; Kamisawa, Akira; Hosaka, Shigetoshi; Kumagai, Yoshinao; Koukitu, Akinori

    2009-02-01

    The effects of growth conditions for ZnO layers grown by halide vapor phase epitaxy (HVPE) on (0 0 0 1) ZnO/sapphire templates are investigated. Micron-sized pyramidal ZnO islands nucleate on the template at the initial growth stage and each island grows differently with the process conditions. The high temperature of 1000 °C promotes a lateral growth rate and coalescence between the islands. The full-width at half-maximums (FWHMs) of X-ray rocking curves for the (0 0 0 2) and (1 0 1¯ 1) planes from a fully coalesced ZnO layer are quite narrow values below 160 arcsec. Transmission electron microscopy (TEM) reveals that screw character dislocations in the template do not propagate into the HVPE-grown layer.

  8. A nitride-based epitaxial surface layer formed by ammonia treatment of silicene-terminated ZrB2

    NASA Astrophysics Data System (ADS)

    Wiggers, F. B.; Van Bui, H.; Friedlein, R.; Yamada-Takamura, Y.; Schmitz, J.; Kovalgin, A. Y.; de Jong, M. P.

    2016-04-01

    We present a method for the formation of an epitaxial surface layer involving B, N, and Si atoms on a ZrB2(0001) thin film on Si(111). It has the potential to be an insulating growth template for 2D semiconductors. The chemical reaction of NH3 molecules with the silicene-terminated ZrB2 surface was characterized by synchrotron-based, high-resolution core-level photoelectron spectroscopy and low-energy electron diffraction. In particular, the dissociative chemisorption of NH3 at 400 °C leads to surface nitridation, and subsequent annealing up to 830 °C results in a solid phase reaction with the ZrB2 subsurface layers. In this way, a new nitride-based epitaxial surface layer is formed with hexagonal symmetry and a single in-plane crystal orientation.

  9. DOE-EPSCoR. Exchange interactions in epitaxial intermetallic layered systems

    SciTech Connect

    LeClair, Patrick R.; Gary, Mankey J.

    2015-05-25

    The goal of this research is to develop a fundamental understanding of the exchange interactions in epitaxial intermetallic alloy thin films and multilayers, including films and multilayers of Fe-Pt, Co-Pt and Fe-P-Rh alloys deposited on MgO and Al2O3 substrates. Our prior results have revealed that these materials have a rich variety of ferromagnetic, paramagnetic and antiferromagnetic phases which are sensitive functions of composition, substrate symmetry and layer thickness. Epitaxial antiferromagnetic films of FePt alloys exhibit a different phase diagram than bulk alloys. The antiferromagnetism of these materials has both spin ordering transitions and spin orienting transitions. The objectives include the study of exchange-inversion materials and the interface of these materials with ferromagnets. Our aim is to formulate a complete understanding of the magnetic ordering in these materials, as well as developing an understanding of how the spin structure is modified through contact with a ferromagnetic material at the interface. The ultimate goal is to develop the ability to tune the phase diagram of the materials to produce layered structures with tunable magnetic properties. The alloy systems that we will study have a degree of complexity and richness of magnetic phases that requires the use of the advanced tools offered by the DOE-operated national laboratory facilities, such as neutron and x-ray scattering to measure spin ordering, spin orientations, and element-specific magnetic moments. We plan to contribute to DOE’s mission of producing “Materials by Design” with properties determined by alloy composition and crystal structure. We have developed the methods for fabricating and have performed neutron diffraction experiments on some of the most interesting phases, and our work will serve to answer questions raised about the element-specific magnetizations using the magnetic x-ray dichroism techniques and interface magnetism in layered structures

  10. Arsenic redistribution after solid phase epitaxial regrowth of shallow pre-amorphized silicon layers

    SciTech Connect

    Demenev, E.; Giubertoni, D.; Gennaro, S.; Bersani, M.; Hourdakis, E.; Nassiopoulou, A. G.; Reading, M. A.; Berg, J. A. van den

    2012-11-06

    The behavior of ultra shallow ion implants of arsenic in Si following solid phase epitaxial re-growth process is reported. A 16 nm amorphous layer was created by ion implantation of Si{sup +} at energy 5 keV and a dose 1 Multiplication-Sign 10{sup 15} at/cm{sup 2}. As ion were implanted at 2 keV using 3 different doses: 1 Multiplication-Sign 10{sup 14}, 5 Multiplication-Sign 10{sup 14} and 1 Multiplication-Sign 10{sup 15} at/cm{sup 2}. The resulting As distributions, confined in the amorphous layer, were thermally treated at 550 Degree-Sign C for 5-300 s in order to electrically activate dopant atoms. Crystal re-growth and As redistribution was investigated by secondary ion mass spectrometry and medium energy ion scattering. A growth rate depending on the As concentration was observed, the rate being slower for higher As content. Arsenic re-distribution to the surface and at the end-of-range defects was observed and a segregation model was developed. Finally, the substitutional fraction of As atoms was related to sheet resistance measurements revealing a higher fraction of electrically active dopant atoms in pre-amorphized samples compared to not pre-amorphized.

  11. Hetero-epitaxy of ε-Ga2O3 layers by MOCVD and ALD

    NASA Astrophysics Data System (ADS)

    Boschi, F.; Bosi, M.; Berzina, T.; Buffagni, E.; Ferrari, C.; Fornari, R.

    2016-06-01

    Growth of gallium oxide thin films was carried out by Metalorganic Chemical Vapor Deposition (MOCVD) at different temperatures. Pure ε-phase epilayers of Ga2O3, with good morphology and structural properties, were obtained, for the first time with this technique, on sapphire at the temperature of 650 °C. XRD analysis performed by high-resolution diffractometry confirmed the good crystallographic quality of the grown layers. At temperatures higher than 700 °C the usual stable β-Ga2O3 phase was obtained. The ε-films were successfully deposited also on (0001)-oriented GaN and (111)- and (001)-oriented 3C-SiC templates, provided that the appropriate temperature was chosen. This indicates that the temperature, rather than substrate structure, is the growth parameter which decides what phase actually forms. The growth proceeds via coalescence of hexagonal islands and is favored when a substrate with an in-plane hexagonal arrangement of the atoms is employed. By applying Atomic Layer Deposition (ALD), epitaxial growth of the ε-phase was achieved at lower temperature, while the overall uniformity resulted improved, even on large sapphire substrates.

  12. Layer by Layer Three-dimensional Tissue Epitaxy by Cell-Laden Hydrogel Droplets

    PubMed Central

    Moon, SangJun; Hasan, Syed K.; Song, Young S.; Xu, Feng; Keles, Hasan Onur; Manzur, Fahim; Mikkilineni, Sohan; Hong, Jong Wook; Nagatomi, Jiro; Haeggstrom, Edward; Khademhosseini, Ali

    2010-01-01

    The ability to bioengineer three-dimensional (3D) tissues is a potentially powerful approach to treat diverse diseases such as cancer, loss of tissue function, or organ failure. Traditional tissue engineering methods, however, face challenges in fabricating 3D tissue constructs that resemble the native tissue microvasculature and microarchitectures. We have developed a bioprinter that can be used to print 3D patches of smooth muscle cells (5 mm × 5 mm × 81 μm) encapsulated within collagen. Current inkjet printing systems suffer from loss of cell viability and clogging. To overcome these limitations, we developed a system that uses mechanical valves to print high viscosity hydrogel precursors containing cells. The bioprinting platform that we developed enables (i) printing of multilayered 3D cell-laden hydrogel structures (16.2 μm thick per layer) with controlled spatial resolution (proximal axis: 18.0 ± 7.0 μm and distal axis: 0.5 ± 4.9 μm), (ii) high-throughput droplet generation (1 s per layer, 160 droplets/s), (iii) cell seeding uniformity (26 ± 2 cells/mm2 at 1 million cells/mL, 122 ± 20 cells/mm2 at 5 million cells/mL, and 216 ± 38 cells/mm2 at 10 million cells/mL), and (iv) long-term viability in culture (>90%, 14 days). This platform to print 3D tissue constructs may be beneficial for regenerative medicine applications by enabling the fabrication of printed replacement tissues. PMID:19586367

  13. Heavily boron-doped Si layers grown below 700 C by molecular beam epitaxy using a HBO2 source

    NASA Technical Reports Server (NTRS)

    Lin, T. L.; Fathauer, R. W.; Grunthaner, P. J.

    1989-01-01

    Boron doping in Si layers grown by molecular beam epitaxy (MBE) at 500-700 C using an HBO2 source has been studied. The maximum boron concentration without detectable oxygen incorporation for a given substrate temperature and Si growth rate has been determined using secondary-ion mass spectrometry analysis. Boron present in the Si MBE layers grown at 550-700 C was found to be electrically active, independent of the amount of oxygen incorporation. By reducing the Si growth rate, highly boron-doped layers have been grown at 600 C without detectable oxygen incorporation.

  14. Spin transport in epitaxial magnetic manganite/ruthenate heterostructures with an LaMnO{sub 3} layer

    SciTech Connect

    Petrzhik, A. M. Ovsyannikov, G. A.; Shadrin, A. V.; Khaidukov, Yu. N.; Mustafa, L.

    2014-12-15

    Epitaxial La{sub 0.7}Sr{sub 0.3}MnO{sub 3}/LaMnO{sub 3}/SrRuO{sub 3} (LSMO/LMO/SRO) heterostructures with an LMO layer 0–35 nm thick are grown by laser ablation on an NdGaO{sub 3} substrate at a high temperature. X-ray diffraction and transmission electron microscopy demonstrate sharp interfaces and epitaxial growth of the LSMO and SRO layers in the heterostructures at an LMO layer thickness of 0–35 nm. SQUID measurements of the magnetic moment of the heterostructures with an LMO layer and the data obtained with reflectometry of polarized neutrons show that the manganite LMO layer is a ferromagnet at a temperature below 150 K and strongly affects the magnetic moment of the heterostructures at low temperatures. The magnetoresistance of the mesostructure created from the heterostructure using lithography and ion etching decreases with increasing LMO layer thickness and weakly depends on the direction of an applied magnetic field. If the LMP layer is absent, a negative magnetoresistance is detected; it is likely to be caused by a negative magnetization of the SRO layer.

  15. Layer-Controlled Chemical Vapor Deposition Growth of MoS2 Vertical Heterostructures via van der Waals Epitaxy.

    PubMed

    Samad, Leith; Bladow, Sage M; Ding, Qi; Zhuo, Junqiao; Jacobberger, Robert M; Arnold, Michael S; Jin, Song

    2016-07-26

    The fascinating semiconducting and optical properties of monolayer and few-layer transition metal dichalcogenides, as exemplified by MoS2, have made them promising candidates for optoelectronic applications. Controllable growth of heterostructures based on these layered materials is critical for their successful device applications. Here, we report a direct low temperature chemical vapor deposition (CVD) synthesis of MoS2 monolayer/multilayer vertical heterostructures with layer-controlled growth on a variety of layered materials (SnS2, TaS2, and graphene) via van der Waals epitaxy. Through precise control of the partial pressures of the MoCl5 and elemental sulfur precursors, reaction temperatures, and careful tracking of the ambient humidity, we have successfully and reproducibly grown MoS2 vertical heterostructures from 1 to 6 layers over a large area. The monolayer MoS2 heterostructure was verified using cross-sectional high resolution transmission electron microscopy (HRTEM) while Raman and photoluminescence spectroscopy confirmed the layer-controlled MoS2 growth and heterostructure electronic interactions. Raman, photoluminescence, and energy dispersive X-ray spectroscopy (EDS) mappings verified the uniform coverage of the MoS2 layers. This reaction provides an ideal method for the scalable layer-controlled growth of transition metal dichalcogenide heterostructures via van der Waals epitaxy for a variety of optoelectronic applications. PMID:27373305

  16. Layer-Controlled Chemical Vapor Deposition Growth of MoS2 Vertical Heterostructures via van der Waals Epitaxy.

    PubMed

    Samad, Leith; Bladow, Sage M; Ding, Qi; Zhuo, Junqiao; Jacobberger, Robert M; Arnold, Michael S; Jin, Song

    2016-07-26

    The fascinating semiconducting and optical properties of monolayer and few-layer transition metal dichalcogenides, as exemplified by MoS2, have made them promising candidates for optoelectronic applications. Controllable growth of heterostructures based on these layered materials is critical for their successful device applications. Here, we report a direct low temperature chemical vapor deposition (CVD) synthesis of MoS2 monolayer/multilayer vertical heterostructures with layer-controlled growth on a variety of layered materials (SnS2, TaS2, and graphene) via van der Waals epitaxy. Through precise control of the partial pressures of the MoCl5 and elemental sulfur precursors, reaction temperatures, and careful tracking of the ambient humidity, we have successfully and reproducibly grown MoS2 vertical heterostructures from 1 to 6 layers over a large area. The monolayer MoS2 heterostructure was verified using cross-sectional high resolution transmission electron microscopy (HRTEM) while Raman and photoluminescence spectroscopy confirmed the layer-controlled MoS2 growth and heterostructure electronic interactions. Raman, photoluminescence, and energy dispersive X-ray spectroscopy (EDS) mappings verified the uniform coverage of the MoS2 layers. This reaction provides an ideal method for the scalable layer-controlled growth of transition metal dichalcogenide heterostructures via van der Waals epitaxy for a variety of optoelectronic applications.

  17. Epitaxial growth of zinc oxide by the method of atomic layer deposition on SiC/Si substrates

    NASA Astrophysics Data System (ADS)

    Kukushkin, S. A.; Osipov, A. V.; Romanychev, A. I.

    2016-07-01

    For the first time, zinc oxide epitaxial films on silicon were grown by the method of atomic layer deposition at a temperature T = 250°C. In order to avoid a chemical reaction between silicon and zinc oxide (at the growth temperature, the rate constant of the reaction is of the order of 1022), a high-quality silicon carbide buffer layer with a thickness of ~50 nm was preliminarily synthesized by the chemical substitution of atoms on the silicon surface. The zinc oxide films were grown on n- and p-type Si(100) wafers. The ellipsometric, Raman, electron diffraction, and trace element analyses showed that the ZnO films are epitaxial.

  18. Study of photoresponsivity in optoelectronic devices based on single crystal β-Ga2O3 epitaxial layers

    NASA Astrophysics Data System (ADS)

    Horng, Ray-Hua; Ravadgar, Parvaneh

    2013-03-01

    Single crystal β-Ga2O3 epitaxial layers have been prepared on c-axis (0001) sapphire substrates using metalorganic chemical vapor deposition technique at relatively low temperature. Post-annealing of β-Ga2O3 single crystals up to 800 °C does not affect the crystallinity, explored by x-ray diffraction, showing that β-Ga2O3 epitaxial layers are highly (-201) oriented. Metal-semiconductor-metal devices are fabricated on single crystals to study their photoresponsivity. A significant improvement in performance of post annealed-based devices is observed, attributed to point defect reduction. Annealing of as-grown samples results to a significant decrease in both oxygen and gallium vacancies, which are sources of current leakage.

  19. Tellurium-Assisted Epitaxial Growth of Large-Area, Highly Crystalline ReS2 Atomic Layers on Mica Substrate.

    PubMed

    Cui, Fangfang; Wang, Cong; Li, Xiaobo; Wang, Gang; Liu, Kaiqiang; Yang, Zhou; Feng, Qingliang; Liang, Xing; Zhang, Zhongyue; Liu, Shengzhong; Lei, Zhibin; Liu, Zonghuai; Xu, Hua; Zhang, Jin

    2016-07-01

    Anisotropic 2D layered material rhenium disulfide (ReS2 ) with high crystal quality and uniform monolayer thickness is synthesized by using tellurium-assisted epitaxial growth on mica substrate. Benefit from the lower eutectic temperature of rhenium-tellurium binary eutectic, ReS2 can grow from rhenium (melting point at 3180 °C) and sulfur precursors in the temperature range of 460-900 °C with high efficiency. PMID:27121002

  20. Electrochemical removal of hydrogen atoms in Mg-doped GaN epitaxial layers

    SciTech Connect

    Lee, June Key E-mail: hskim7@jbnu.ac.kr; Hyeon, Gil Yong; Tawfik, Wael Z.; Choi, Hee Seok; Ryu, Sang-Wan; Jeong, Tak; Jung, Eunjin; Kim, Hyunsoo E-mail: hskim7@jbnu.ac.kr

    2015-05-14

    Hydrogen atoms inside of an Mg-doped GaN epitaxial layer were effectively removed by the electrochemical potentiostatic activation (EPA) method. The role of hydrogen was investigated in terms of the device performance of light-emitting diodes (LEDs). The effect of the main process parameters for EPA such as solution type, voltage, and time was studied and optimized for application to LED fabrication. In optimized conditions, the light output of 385-nm LEDs was improved by about 26% at 30 mA, which was caused by the reduction of the hydrogen concentration by ∼35%. Further removal of hydrogen seems to be involved in the breaking of Ga-H bonds that passivate the nitrogen vacancies. An EPA process with high voltage breaks not only Mg-H bonds that generate hole carriers but also Ga-H bonds that generate electron carriers, thus causing compensation that impedes the practical increase of hole concentration, regardless of the drastic removal of hydrogen atoms. A decrease in hydrogen concentration affects the current-voltage characteristics, reducing the reverse current by about one order and altering the forward current behavior in the low voltage region.

  1. Current-driven complex dynamics of single-layer epitaxial islands on substrates

    NASA Astrophysics Data System (ADS)

    Dasgupta, Dwaipayan; Maroudas, Dimitrios

    2015-03-01

    We study theoretically the current-driven dynamics of isolated single-layer epitaxial islands on crystalline substrates, which provides important guidance toward surface nanopatterning approaches based on the current-driven assembly of such islands. We develop and validate a fully nonlinear model for the islands' driven morphological evolution on elastic substrates of face-centered cubic crystals in the regime where diffusional mass transport is limited to the island edge. For islands on <110>-, <100>-, and <111>-oriented substrate surfaces, we report a transition in the asymptotic states reached by such driven island dynamics from steady to oscillatory, mediated by Hopf bifurcation. We characterize the bifurcation and explore the dependence of the stable time-periodic state beyond the Hopf point on the misorientation angle between the applied electric field and fast edge diffusion directions, the strength of the edge diffusional anisotropy, and the island size. For islands larger than a critical size, depending on the orientation of the substrate surface, we observe fingering and necking instabilities in the island morphology. We carry out a comprehensive numerical simulation study and explore the complexity of the driven island dynamics with the variation of the problem parameters.

  2. Scanning tunneling microscopic analysis of Cu(In,Ga)Se{sub 2} epitaxial layers

    SciTech Connect

    Mayer, Marie A.; Hebert, Damon; Rockett, Angus A.; Ruppalt, Laura B.; Lyding, Joseph

    2010-02-15

    Scanning tunneling microscopy (STM) measurements have been made on single-crystal epitaxial layers of CuInSe{sub 2} grown on GaAs substrates. Results were obtained for as-grown, air-exposed, and cleaned surfaces; in situ cleaved surfaces; surfaces sputtered and annealed in the STM system; and samples prepared by a light chemical etch. Conventional constant-current topographs, current-voltage curves, and current imaging tunneling spectroscopy (CITS) scans were obtained. Topographic images show that the surfaces appear rough on the atomic scale and often exhibit regular features consistent with a previously proposed surface ad-dimer reconstruction. CITS scans show a spatially varying energy gap consistent with band-edge fluctuations on a scale of a few atomic spacings. Energy variations were observed in both band edges. Although quantitative description of the magnitude of these fluctuations is difficult, the fluctuations on the atomic scale appear much larger than observed by methods such as photoluminescence, which average over larger volumes.

  3. Extrinsic doped n- and p-type CdTe layers grown by organometallic vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Taskar, N. R.; Natarajan, V.; Bhat, I. B.; Grandhi, S. K.

    1988-01-01

    In this paper we report on the extrinsic n- and p-doping of CdTe layers, grown by organometallic vapor phase epitaxy. Triethylindium and arsine gas were used as n- and p-type dopants respectively, with doping levels of around 1017 cm-3 in both cases. Layers were grown on both semi-insulating CdTe and GaAs substrates. Layers grown on semi-insulating GaAs had an intervening 1-2 μm undoped CdTe layer to relieve the strain caused by the large (14.6%) lattice mismatch of the CdTe-GaAs combination. Van der Pauw measurements were made to evaluate the quality of these layers, and mobility values as high as 3600 cm2/V h- s obtained at 40 K for lightly doped n-type samples. Grown junctions, made using extrinsic doped layers, have resulted in diodes with excellent electrical characteristics.

  4. Extrinsic doped n- and p-type CdTe layers grown by organometallic vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Taskar, N. R.; Natarajan, V.; Bhat, I. B.; Grandhi, S. K.

    1990-01-01

    In this paper we report on the extrinsic n- and p-doping of CdTe layers, grown by organometallic vapor phase epitaxy. Triethylindium and arsine gas were used as n- and p-type dopants respectively, with doping levels of around 10 17 cm -3 in both cases. Layers were grown on both semi-insulating CdTe and GaAs substrates. Layers grown on semi-insulating GaAs had an intervening 1-2 μm undoped CdTe layer to relieve the strain caused by the large (14.6%) lattice mismatch of the CdTe-GaAs combination. Van der Pauw measurements were made to evaluate the quality of these layers, and mobility values as high as 3600 cm 2/V h- s obtained at 40 K for lightly doped n-type samples. Grown junctions, made using extrinsic doped layers, have resulted in diodes with excellent electrical characteristics.

  5. Atomic Layer Epitaxy of h-BN(0001) Multilayers on Co(0001) and Molecular Beam Epitaxy Growth of Graphene on h-BN(0001)/Co(0001).

    PubMed

    Driver, M Sky; Beatty, John D; Olanipekun, Opeyemi; Reid, Kimberly; Rath, Ashutosh; Voyles, Paul M; Kelber, Jeffry A

    2016-03-22

    The direct growth of hexagonal boron nitride (h-BN) by industrially scalable methods is of broad interest for spintronic and nanoelectronic device applications. Such applications often require atomically precise control of film thickness and azimuthal registry between layers and substrate. We report the formation, by atomic layer epitaxy (ALE), of multilayer h-BN(0001) films (up to 7 monolayers) on Co(0001). The ALE process employs BCl3/NH3 cycles at 600 K substrate temperature. X-ray photoelectron spectroscopy (XPS) and low energy electron diffraction (LEED) data show that this process yields an increase in h-BN average film thickness linearly proportional to the number of BCl3/NH3 cycles, with BN layers in azimuthal registry with each other and with the Co(0001) substrate. LEED diffraction spot profile data indicate an average BN domain size of at least 1900 Å. Optical microscopy data indicate the presence of some domains as large as ∼20 μm. Transmission electron microscopy (TEM) and ambient exposure studies demonstrate macroscopic and microscopic continuity of the h-BN film, with the h-BN film highly conformal to the Co substrate. Photoemission data show that the h-BN(0001) film is p-type, with band bending near the Co/h-BN interface. Growth of graphene by molecular beam epitaxy (MBE) is observed on the surface of multilayer h-BN(0001) at temperatures of 800 K. LEED data indicate azimuthal graphene alignment with the h-BN and Co(0001) lattices, with domain size similar to BN. The evidence of multilayer BN and graphene azimuthal alignment with the lattice of the Co(0001) substrate demonstrates that this procedure is suitable for scalable production of heterojunctions for spintronic applications.

  6. Epitaxial NbN/AlN/NbN tunnel junctions on Si substrates with TiN buffer layers

    NASA Astrophysics Data System (ADS)

    Sun, Rui; Makise, Kazumasa; Zhang, Lu; Terai, Hirotaka; Wang, Zhen

    2016-06-01

    We have developed epitaxial NbN/AlN/NbN tunnel junctions on Si (100) substrates with a TiN buffer layer. A 50-nm-thick (200)-oriented TiN thin film was introduced as the buffer layer for epitaxial growth of NbN/AlN/NbN trilayers on Si substrates. The fabricated NbN/AlN/NbN junctions demonstrated excellent tunneling properties with a high gap voltage of 5.5 mV, a large IcRN product of 3.8 mV, a sharp quasiparticle current rise with a ΔVg of 0.4 mV, and a small subgap leakage current. The junction quality factor Rsg/RN was about 23 for the junction with a Jc of 47 A/cm2 and was about 6 for the junction with a Jc of 3.0 kA/cm2. X-ray diffraction and transmission electron microscopy observations showed that the NbN/AlN/NbN trilayers were grown epitaxially on the (200)-orientated TiN buffer layer and had a highly crystalline structure with the (200) orientation.

  7. Room-temperature ferromagneticlike behavior in Mn-implanted and postannealed InAs layers deposited by molecular beam epitaxy

    SciTech Connect

    Gonzalez-Arrabal, R.; Gonzalez, Y.; Gonzalez, L.; Martin-Gonzalez, M. S.; Munnik, F.

    2009-04-01

    We report on the magnetic and structural properties of Ar- and Mn-implanted InAs epitaxial films grown on GaAs (100) by molecular beam epitaxy and the effect of rapid thermal annealing (RTA) for 30 s at 750 deg. C. Channeling particle induced x-ray emission (PIXE) experiments reveal that after Mn implantation almost all Mn atoms are substitutional in the In site of the InAs lattice, like in a diluted magnetic semiconductor. All of these samples show diamagnetic behavior. However, after RTA treatment the Mn-InAs films exhibit room-temperature magnetism. According to PIXE measurements the Mn atoms are no longer substitutional. When the same set of experiments was performed with Ar as implantation ion, all of the layers present diamagnetism without exception. This indicates that the appearance of room-temperature ferromagneticlike behavior in the Mn-InAs-RTA layer is not related to lattice disorder produced during implantation but to a Mn reaction produced after a short thermal treatment. X-ray diffraction patterns and Rutherford backscattering measurements evidence the segregation of an oxygen-deficient MnO{sub 2} phase (nominally MnO{sub 1.94}) in the Mn-InAs-RTA epitaxial layers which might be the origin of the room-temperature ferromagneticlike response observed.

  8. Formation of buried epitaxial Si-Ge alloy layers in Si<100>crystal by high dose Ge ion implantation

    SciTech Connect

    Yu, Kin Man; Brown, I.G.; Im, S.

    1991-11-01

    We have synthesized single crystal Si{sub 1-x}Ge{sub x} alloy layers in Si <100> crystals by high dose Ge ion implantation and solid phase epitaxy. The implantation was performed using the metal vapor vacuum arc (Mevva) ion source. Ge ions at mean energies of 70 and 1000 keV and with doses ranging from 1{times}10{sup 16} to 7{times}10{sup 16} ions/cm{sup 2} were implanted into Si <100> crystals at room temperature, resulting in the formation of Si{sub 1-x}Ge{sub x} alloy layers with peak Ge concentrations of 4 to 13 atomic %. Epitaxial regrowth of the amorphous layers were initiated by thermal annealing at temperatures higher than 500{degrees}C. The solid phase epitaxy process, the crystal quality, microstructures, interface morphology and defect structures were characterized by ion channeling and transmission electron microscopy. Compositionally graded single crystal Si{sub 1-x}Ge{sub x} layers with full width at half maximum {approximately}100nm were formed under a {approximately}30nm Si layer after annealing at 600{degrees}C for 15 min. A high density of defects was found in the layers as well as in the substrate Si just below the original amorphous/crystalline interface. The concentration of these defects was significantly reduced after annealing at 900{degrees}C. The kinetics of the regrowth process, the crystalline quality of the alloy layers, the annealing characteristics of the defects, and the strains due to the lattice mismatch between the alloy and the substrate are discussed.

  9. Self-assembled Multilayers of Silica Nanospheres for Defect Reduction in Non- and Semipolar Gallium Nitride Epitaxial Layers

    PubMed Central

    2015-01-01

    Non- and semipolar GaN have great potential to improve the efficiency of light emitting devices due to much reduced internal electric fields. However, heteroepitaxial GaN growth in these crystal orientations suffers from very high dislocation and stacking faults densities. Here, we report a facile method to obtain low defect density non- and semipolar heteroepitaxial GaN via selective area epitaxy using self-assembled multilayers of silica nanospheres (MSN). Nonpolar (11–20) and semipolar (11–22) GaN layers with high crystal quality have been achieved by epitaxial integration of the MSN and a simple one-step overgrowth process, by which both dislocation and basal plane stacking fault densities can be significantly reduced. The underlying defect reduction mechanisms include epitaxial growth through the MSN covered template, island nucleation via nanogaps in the MSN, and lateral overgrowth and coalescence above the MSN. InGaN/GaN multiple quantum wells structures grown on a nonpolar GaN/MSN template show more than 30-fold increase in the luminescence intensity compared to a control sample without the MSN. This self-assembled MSN technique provides a new platform for epitaxial growth of nitride semiconductors and offers unique opportunities for improving the material quality of GaN grown on other orientations and foreign substrates or heteroepitaxial growth of other lattice-mismatched materials. PMID:27065755

  10. Vertically aligned GaAs nanowires on graphite and few-layer graphene: generic model and epitaxial growth.

    PubMed

    Munshi, A Mazid; Dheeraj, Dasa L; Fauske, Vidar T; Kim, Dong-Chul; van Helvoort, Antonius T J; Fimland, Bjørn-Ove; Weman, Helge

    2012-09-12

    By utilizing the reduced contact area of nanowires, we show that epitaxial growth of a broad range of semiconductors on graphene can in principle be achieved. A generic atomic model is presented which describes the epitaxial growth configurations applicable to all conventional semiconductor materials. The model is experimentally verified by demonstrating the growth of vertically aligned GaAs nanowires on graphite and few-layer graphene by the self-catalyzed vapor-liquid-solid technique using molecular beam epitaxy. A two-temperature growth strategy was used to increase the nanowire density. Due to the self-catalyzed growth technique used, the nanowires were found to have a regular hexagonal cross-sectional shape, and are uniform in length and diameter. Electron microscopy studies reveal an epitaxial relationship of the grown nanowires with the underlying graphitic substrates. Two relative orientations of the nanowire side-facets were observed, which is well explained by the proposed atomic model. A prototype of a single GaAs nanowire photodetector demonstrates a high-quality material. With GaAs being a model system, as well as a very useful material for various optoelectronic applications, we anticipate this particular GaAs nanowire/graphene hybrid to be promising for flexible and low-cost solar cells.

  11. Energy band alignment of atomic layer deposited HfO{sub 2} on epitaxial (110)Ge grown by molecular beam epitaxy

    SciTech Connect

    Hudait, M. K.; Zhu, Y.; Maurya, D.; Priya, S.

    2013-03-04

    The band alignment properties of atomic layer HfO{sub 2} film deposited on epitaxial (110)Ge, grown by molecular beam epitaxy, was investigated using x-ray photoelectron spectroscopy. The cross-sectional transmission electron microscopy exhibited a sharp interface between the (110)Ge epilayer and the HfO{sub 2} film. The measured valence band offset value of HfO{sub 2} relative to (110)Ge was 2.28 {+-} 0.05 eV. The extracted conduction band offset value was 2.66 {+-} 0.1 eV using the bandgaps of HfO{sub 2} of 5.61 eV and Ge bandgap of 0.67 eV. These band offset parameters and the interface chemical properties of HfO{sub 2}/(110)Ge system are of tremendous importance for the design of future high hole mobility and low-power Ge-based metal-oxide transistor devices.

  12. Development of Production PVD-AIN Buffer Layer System and Processes to Reduce Epitaxy Costs and Increase LED Efficiency

    SciTech Connect

    Cerio, Frank

    2013-09-14

    The DOE has set aggressive goals for solid state lighting (SSL) adoption, which require manufacturing and quality improvements for virtually all process steps leading to an LED luminaire product. The goals pertinent to this proposed project are to reduce the cost and improve the quality of the epitaxial growth processes used to build LED structures. The objectives outlined in this proposal focus on achieving cost reduction and performance improvements over state-of-the-art, using technologies that are low in cost and amenable to high efficiency manufacturing. The objectives of the outlined proposal focus on cost reductions in epitaxial growth by reducing epitaxy layer thickness and hetero-epitaxial strain, and by enabling the use of larger, less expensive silicon substrates and would be accomplished through the introduction of a high productivity reactive sputtering system and an effective sputtered aluminum-nitride (AlN) buffer/nucleation layer process. Success of the proposed project could enable efficient adoption of GaN on-silicon (GaN/Si) epitaxial technology on 150mm silicon substrates. The reduction in epitaxy cost per cm{sup 2} using 150mm GaN-on-Si technology derives from (1) a reduction in cost of ownership and increase in throughput for the buffer deposition process via the elimination of MOCVD buffer layers and other throughput and CoO enhancements, (2) improvement in brightness through reductions in defect density, (3) reduction in substrate cost through the replacement of sapphire with silicon, and (4) reduction in non-ESD yield loss through reductions in wafer bow and temperature variation. The adoption of 150mm GaN/Si processing will also facilitate significant cost reductions in subsequent wafer fabrication manufacturing costs. There were three phases to this project. These three phases overlap in order to aggressively facilitate a commercially available production GaN/Si capability. In Phase I of the project, the repeatability of the performance

  13. Realization of high quality epitaxial current- perpendicular-to-plane giant magnetoresistive pseudo spin-valves on Si(001) wafer using NiAl buffer layer

    NASA Astrophysics Data System (ADS)

    Chen, Jiamin; Liu, J.; Sakuraba, Y.; Sukegawa, H.; Li, S.; Hono, K.

    2016-05-01

    In this letter, we report a NiAl buffer layer as a template for the integration of epitaxial current-perpendicular-plane-giant magnetoresistive (CPP-GMR) devices on a Si(001) single crystalline substrate. By depositing NiAl on a Si wafer at an elevated temperature of 500 °C, a smooth and epitaxial B2-type NiAl(001) layer was obtained. The surface roughness was further improved by depositing Ag on the NiAl layer and applying subsequent annealing process. The epitaxial CPP-GMR devices grown on the buffered Si(001) substrate present a large magnetoresistive output comparable with that of the devices grown on an MgO(001) substrate, demonstrating the possibility of epitaxial spintronic devices with a NiAl templated Si wafer for practical applications.

  14. Structural Properties of Alternate Monatomic Layered [Fe/Co]n Epitaxial Films on MgO Substrate

    NASA Astrophysics Data System (ADS)

    Chu, In Chang; Saki, Yoshinobu; Kawasaki, Shohei; Doi, Masaaki; Sahashi, Masashi

    2008-06-01

    Body-centered-cubic (bcc) Fe50Co50 material is reported to show a high bulk spin scattering coefficient on current perpendicular to plane-giant magneto-resistance (CPP-GMR) system. But the origin of that phenomenon does not make sure yet. We prepared artificially alternate monatomic layered (AML) [Fe/Co] 41 MLs epitaxial films (Ts: 75, 250 °C) by monatomic deposition method and investigated the topology of AML [Fe/Co]n epitaxial films on MgO substrate with different orientation (001), (011) by the scanning tunnel microscopy (STM) and reflection high energy electron diffraction (RHEED), which we could confirm Frank-van der Merwe (FM) growth mode for AML [Fe/Co]n on MgO(001) and Volmer-Weber (VW) growth mode for that on Mg(011). The roughness of surface, Ra (0.20 nm) of AML [Fe/Co] 41 MLs epitaxial film grown at 75 °C on MgO(001) is smaller than that (0.46 nm) of AML [Fe/Co] grown at 250 °C on MgO(001), which has the large terraces of over 50 nm (Ra: 0.17 nm), even though there are some valleys between large terraces. Moreover we confirmed the structural properties of trilayered epitaxial films with AML [Fe/Co]n (Ra: 0.18 nm) and Fe50Co50 alloy epitaxial film on Au electrode by RHEED before confirming the characteristics of CPP-GMR devices.

  15. Molecular Beam Epitaxial Growth and Characterization of Mismatched Indium Gallium Arsenide and Indium Aluminum Arsenide Layers on Indium Phosphide

    NASA Astrophysics Data System (ADS)

    Bennett, Brian R.

    Mismatched epitaxial layers of In_ {x}Ga_{1-x}As and In_{y}Al_ {1-y}As were grown on (001) InP by molecular beam epitaxy. The layers were characterized by a technique we developed known as variable azimuthal-angle ellipsometry. It reveals large optical anisotropy for many strained layers. We attribute the anisotropy to strain-induced surface roughening during growth. Samples were also characterized by high -resolution x-ray diffraction (HRXRD) to assess layer quality as well as composition and strain. HRXRD measurements reveal orthorhombic distortion of partially relaxed layers of InGaAs and InAlAs in tension or compression, with preferential strain relief in the (110) direction. We show that HRXRD epilayer peak width and interference fringes are sensitive, non-destructive criteria to judge the structural quality of strained heterostructures. For layers ranging from 300 to 10,000 A, with lattice mismatch of +/- 1% or less, the crystalline quality consistently remains high to thicknesses up to 3-9 times the Matthews -Blakeslee critical layer thickness. We investigated the thermal stability of these layers, using HRXRD to measure structural changes caused by high-temperature anneals. We also compared the electron mobility of modulation-doped heterostructures before and after annealing. Both techniques demonstrate that our high-quality strained layers are stable to temperatures of at least 800-850^circ C. We explain this result by the limited sources available for the nucleation of misfit dislocations. The findings are applied to the design and growth of high-performance pseudomorphic InAlAs/InGaAs/InP heterostructure field-effect transistors with layers exceeding the Matthews-Blakeslee limit. (Copies available exclusively from MIT Libraries, Rm. 14-0551, Cambridge, MA 02139-4307. Ph. 617-253-5668; Fax 617-253-1690.).

  16. Assessment of 4H-SiC epitaxial layers and high resistivity bulk crystals for radiation detectors

    NASA Astrophysics Data System (ADS)

    Mandal, Krishna C.; Muzykov, Peter G.; Chaudhuri, Sandeep K.; Terry, J. R.

    2012-10-01

    We present results of structural, electrical, and defect characterization of 4H-SiC epitaxial layers and bulk crystals and show performance of the radiation detectors fabricated from these materials. The crystal quality was evaluated by x-ray diffraction (XRD) rocking curve measurements, electron beam induced current (EBIC) imaging, and defect delineating etching in conjunction with optical microscopy and scanning electron microscopy (SEM). Studies of the electrically active intrinsic defects and impurities were conducted using thermally stimulated current (TSC) measurements in a wide temperature range of 94 - 750K. The results are correlated with the capability of bulk crystals and epitaxial layers for the detection of α-particles, low to high energy x-rays and gamma rays. High barrier rectifying Schottky diodes have been fabricated and tested. The epitaxial 4H-SiC radiation detectors exhibited low leakage current (< 1 nA) at ~ 200 V operating voltage up to 200 C. The soft x-ray responsivity measurements performed at the National Synchrotron Light Source (NSLS) at Brookhaven National Lab (BNL) showed significantly improved characteristics compared to commercially-available SiC UV photodiode detectors.

  17. Epitaxial Crystal Silicon Absorber Layers and Solar Cells Grown at 1.8 Microns per Minute: Preprint

    SciTech Connect

    Bobela, D. C.; Teplin, C. W.; Young, D. L.; Branz, H. M.; Stradins, P.

    2011-07-01

    We have grown device-quality epitaxial silicon thin films at growth rates up to 1.8 μm/min, using hot-wire chemical vapor deposition from silane at substrate temperatures below 750 degrees C. At these rates, which are more than 30 times faster than those used by the amorphous and nanocrystalline Si industry, capital costs for large-scale solar cell production would be dramatically reduced, even for cell absorber layers up to 10 ?m thick. We achieved high growth rates by optimizing the three key parameters: silane flow, depletion, and filament geometry, based on our model developed earlier. Hydrogen coverage of the filament surface likely limits silane decomposition and growth rate at high system pressures. No considerable deterioration in PV device performance is observed when grown at high rate, provided that the epitaxial growth is initiated at low rate. A simple mesa device structure (wafer/epi Si/a-Si(i)/a-Si:H(p)/ITO) with a 2.3 um epitaxial silicon absorber layer was grown at 700 nm/min. The finished device had an open-circuit voltage of 0.424 V without hydrogenation treatment.

  18. Van der Waals epitaxial double heterostructure: InAs/single-layer graphene/InAs.

    PubMed

    Hong, Young Joon; Yang, Jae Won; Lee, Wi Hyoung; Ruoff, Rodney S; Kim, Kwang S; Fukui, Takashi

    2013-12-17

    Van der Waals (vdW) epitaxial double heterostructures have been fabricated by vdW epitaxy of InAs nanostructures on both sides of graphene. InAs nanostructures diametrically form on/underneath graphene exclusively along As-polar direction, indicating polarity inversion of the double heterostructures. First-principles and density functional calculations demonstrate how and why InAs easily form to be double heterostructures with polarity inversion.

  19. Segregation of Sb in Ge epitaxial layers and its usage for the selective doping of Ge-based structures

    SciTech Connect

    Antonov, A. V.; Drozdov, M. N.; Novikov, A. V. Yurasov, D. V.

    2015-11-15

    The segregation of Sb in Ge epitaxial layers grown by the method of molecular beam epitaxy on Ge (001) substrates is investigated. For a growth temperature range of 180–325°C, the temperature dependence is determined for the segregation ratio of Sb in Ge, which shows a sharp increase (by more than three orders of magnitude) with increasing temperature. The strong dependence of the segregation properties of Sb on the growth temperature makes it possible to adapt a method based on the controlled use of segregation developed previously for the doping of Si structures for the selective doping of Ge structures with a donor impurity. Using this method selectively doped Ge:Sb structures, in which the bulk impurity concentration varies by an order of magnitude at distances of 3–5 nm, are obtained.

  20. Synthesis, structure and electrochemical properties of novel Li-Co-Mn-O epitaxial thin-film electrode using layer-by-layer deposition process

    NASA Astrophysics Data System (ADS)

    Lim, Jaemin; Lee, Soyeon; Suzuki, Kota; Kim, KyungSu; Kim, Sangryun; Taminato, Sou; Hirayama, Masaaki; Oshima, Yoshifumi; Takayanagi, Kunio; Kanno, Ryoji

    2015-04-01

    A novel epitaxial thin-film electrode for lithium batteries, with a composition of Li0.92Co0.65Mn1.35O4 and a cubic spinel structure, is fabricated on a SrTiO3(111) single-crystal substrate. Fabrication is carried out by layer-by-layer pulsed laser deposition of LiCoO2 with a layered rock-salt structure and LiMn2O4 with a spinel structure. The electrode is found to exhibit unique disordering of the lithium (8a) and transition-metal (16d) sites, leading to a higher rate capability and cycle retention ratio than those for a thin-film electrode with the same composition prepared by a conventional single-step deposition process. The proposed layer-by-layer deposition method allows an expanded range of compositional and structural variations for lithium battery electrode materials.

  1. Energy band alignment of atomic layer deposited HfO{sub 2} oxide film on epitaxial (100)Ge, (110)Ge, and (111)Ge layers

    SciTech Connect

    Hudait, Mantu K.; Zhu Yan

    2013-03-21

    Crystallographically oriented epitaxial Ge layers were grown on (100), (110), and (111)A GaAs substrates by in situ growth process using two separate molecular beam epitaxy chambers. The band alignment properties of atomic layer hafnium oxide (HfO{sub 2}) film deposited on crystallographically oriented epitaxial Ge were investigated using x-ray photoelectron spectroscopy (XPS). Valence band offset, {Delta}E{sub v} values of HfO{sub 2} relative to (100)Ge, (110)Ge, and (111)Ge orientations were 2.8 eV, 2.28 eV, and 2.5 eV, respectively. Using XPS data, variation in valence band offset, {Delta}E{sub V}(100)Ge>{Delta}E{sub V}(111)Ge>{Delta}E{sub V}(110)Ge, was obtained related to Ge orientation. Also, the conduction band offset, {Delta}E{sub c} relation, {Delta}E{sub c}(110)Ge>{Delta}E{sub c}(111)Ge>{Delta}E{sub c}(100)Ge related to Ge orientations was obtained using the measured bandgap of HfO{sub 2} on each orientation and with the Ge bandgap of 0.67 eV. These band offset parameters for carrier confinement would offer an important guidance to design Ge-based p- and n-channel metal-oxide field-effect transistor for low-power application.

  2. Phase-separated, epitaxial composite cap layers for electronic device applications and method of making the same

    DOEpatents

    Aytug, Tolga; Paranthaman, Mariappan Parans; Polat, Ozgur

    2012-07-17

    An electronic component that includes a substrate and a phase-separated layer supported on the substrate and a method of forming the same are disclosed. The phase-separated layer includes a first phase comprising lanthanum manganate (LMO) and a second phase selected from a metal oxide (MO), metal nitride (MN), a metal (Me), and combinations thereof. The phase-separated material can be an epitaxial layer and an upper surface of the phase-separated layer can include interfaces between the first phase and the second phase. The phase-separated layer can be supported on a buffer layer comprising a composition selected from the group consisting of IBAD MgO, LMO/IBAD-MgO, homoepi-IBAD MgO and LMO/homoepi-MgO. The electronic component can also include an electronically active layer supported on the phase-separated layer. The electronically active layer can be a superconducting material, a ferroelectric material, a multiferroic material, a magnetic material, a photovoltaic material, an electrical storage material, and a semiconductor material.

  3. Crystal Growth and Characterization of Epitaxial Layers of Laser and Nonlinear Optical Materials for Thin-Disk and Waveguide laser applications

    SciTech Connect

    W Bolanos; M Segura; J Cugat; J Carvajal; X Mateos; M Pujol; R Solé; F Díaz; M Aguiló; et. al.

    2011-12-31

    This paper summarizes the main results we obtained in our laboratories in relation with crystalline layers obtained by liquid phase epitaxial growth of lanthanide doped KLu(WO{sub 4}){sub 2} and Nb:RbTiOPO{sub 4} grown on KLu(WO{sub 4}){sub 2} and RbTiOPO{sub 4} substrates, respectively. Macroscopic defect free epitaxial layers were grown and characterized in terms of their compositional homogeneity, structural stress in the layer/substrate interface and laser and waveguiding performances.

  4. Tunneling Atomic Force Microscopy Studies on Surface Growth Pits Due to Dislocations in 4H-SiC Epitaxial Layers

    NASA Astrophysics Data System (ADS)

    Ohtani, Noboru; Ushio, Shoji; Kaneko, Tadaaki; Aigo, Takashi; Katsuno, Masakazu; Fujimoto, Tatsuo; Ohashi, Wataru

    2012-08-01

    The morphological and electrical properties of surface growth pits caused by dislocations in 4H-SiC epitaxial layers were characterized using tunneling atomic force microscopy. The characteristic distribution of the tip current between the metal-coated atomic force microscopy tip and the SiC was observed within a large surface growth pit caused by a threading screw dislocation. The current was highly localized inside the pit and occurred only on the inclined surface in the up-step direction near the pit bottom. This paper discusses the causes and possible mechanisms of the observed tip current distribution inside surface growth pits.

  5. Surface morphology of molecular-beam epitaxially grown Si(1-x)Ge(x) layers on (100) and (110) Si

    NASA Technical Reports Server (NTRS)

    Pike, W. T.; Fathauer, R. W.; Anderson, M. S.

    1992-01-01

    The surface morphology and dislocation structure of Si(1-x)Ge(x) layers grown on (100) and (110) Si substrates have been investigated using atomic force microscopy, and scanning and transmission electron microscopy. The layers, which have up to a 1.2 percent lattice mismatch with the substrates, were grown by molecular-beam epitaxy at 550 C at thicknesses above those required for the introduction of dislocations. Si(1-x)Ge(x) layers grown on (100) show a crosshatch morphology which is correlated to the underlying misfit dislocation network. Annealing greatly enhances the surface roughness producing a partial islanding growing on the preexisting crosshatch morphology. On the (110) substrates no annealing is necessary to produce a roughened surface. The roughened surface morphology is analyzed as a strain-reducing growth mode which enables partial relaxation of the near-surface atomic planes.

  6. Crystallographic properties of as grown CdxHg1- xTe epitaxial layers deposited by cathodic sputtering

    NASA Astrophysics Data System (ADS)

    Roussille, R.

    Large areas (up to 15 cm 2) CdxHg1- xTe epitaxial layers with Cd composition ( x value) from 0.14 to 0.4 (thickness < 15 μm) have been sputtered on to CdTe substrates with [111] orientations. The layers are grown on substrates heated up to 200°C with a deposition rate of 0.6 μm/h. Crystallographic characterization has been carried out, using different techniques such as: reflection high energy electron diffraction (RHEED), reflection X-ray topography and transmission electron microscopy (TEM). RHEED patterns reveal a good crystallographic quality. X-ray topographies show that the substructure of the layer is very similar to that of the substrate. These results are confirmed by TEM observations.

  7. Hot-electron induced degradations in GaN-based LEDs fabricated on nanoscale epitaxial lateral overgrown layers

    NASA Astrophysics Data System (ADS)

    Zhang, Z. W.; Zhu, C. F.; Fong, W. K.; Leung, K. K.; Chan, P. K. L.; Surya, C.

    2011-08-01

    We report investigations on the hot-electron hardness of GaN-based multiple quantum wells (MQWs) fabricated on nanoscale epitaxial lateral overgrown (NELO) GaN layers. This layer was deposited using a SiO 2 growth mask with nanometer-scale windows. The active regions of the devices consist of five-period GaN/InGaN MQWs. Structural analyses of the material indicate significant reduction in the threading dislocation density of the devices compared to the control which were fabricated without the use of the NELO GaN layers. The hot-electron degradation of the devices due to the application of a large dc. current was characterized by detailed examination of the electroluminescence (EL), I- V, thermoreflectance and the current noise power spectra of the devices as a function of the stress time. Significant improvements in the hot-electron hardness were observed in the device compared to the control.

  8. Molecular beam epitaxy growth of SrO buffer layers on graphite and graphene for the integration of complex oxides

    NASA Astrophysics Data System (ADS)

    Ahmed, Adam S.; Wen, Hua; Ohta, Taisuke; Pinchuk, Igor V.; Zhu, Tiancong; Beechem, Thomas; Kawakami, Roland K.

    2016-08-01

    We report the successful growth of high-quality SrO films on highly-ordered pyrolytic graphite (HOPG) and single-layer graphene by molecular beam epitaxy. The SrO layers have (001) orientation as confirmed by X-ray diffraction (XRD) while atomic force microscopy measurements show continuous pinhole-free films having rms surface roughness of <1.5 Å. Transport measurements of exfoliated graphene after SrO deposition show a strong dependence between the Dirac point and Sr oxidation. Subsequently, the SrO is leveraged as a buffer layer for more complex oxide integration via the demonstration of (001) oriented SrTiO3 grown atop a SrO/HOPG stack.

  9. Molecular beam epitaxy growth of SrO buffer layers on graphite and graphene for the integration of complex oxides

    DOE PAGES

    Ahmed, Adam S.; Wen, Hua; Ohta, Taisuke; Pinchuk, Igor V.; Zhu, Tiancong; Beechem, Thomas; Kawakami, Roland K.

    2016-04-27

    Here, we report the successful growth of high-quality SrO films on highly-ordered pyrolytic graphite (HOPG) and single-layer graphene by molecular beam epitaxy. The SrO layers have (001) orientation as confirmed by X-ray diffraction (XRD) while atomic force microscopy measurements show continuous pinhole-free films having rms surface roughness of <1.5 Å. Moreover, transport measurements of exfoliated graphene, after SrO deposition, show a strong dependence between the Dirac point and Sr oxidation. As a result, the SrO is leveraged as a buffer layer for more complex oxide integration via the demonstration of (001) oriented SrTiO3 grown atop a SrO/HOPG stack.

  10. Elemental boron-doped p(+)-SiGe layers grown by molecular beam epitaxy for infrared detector applications

    NASA Technical Reports Server (NTRS)

    Lin, T. L.; George, T.; Jones, E. W.; Ksendzov, A.; Huberman, M. L.

    1992-01-01

    SiGe/Si heterojunction internal photoemission (HIP) detectors have been fabricated utilizing molecular beam epitaxy of p(+)-SiGe layers on p(-)-Si substrates. Elemental boron from a high-temperature effusion cell was used as the dopant source during MBE growth, and high doping concentrations have been achieved. Strong infrared absorption, mainly by free-carrier absorption, was observed for the degenerately doped SiGe layers. The use of elemental boron as the dopant source allows a low MBE growth temperature, resulting in improved crystalline quality and smooth surface morphology of the Si(0.7)Ge(0.3) layers. Nearly ideal thermionic emission dark current characteristics have been obtained. Photoresponse of the HIP detectors in the long-wavelength infrared regime has been demonstrated.

  11. The driving force for glide of a threading dislocation in a strained epitaxial layer on a substrate

    NASA Astrophysics Data System (ADS)

    Freund, L. B.

    T HE PROCESS of epitaxial growth of a very thin layer onto a substrate crystal is considered for the particular situation in which the layer and substrate materials have the same crystal structure and orientation but different lattice parameters. Under these conditions, the layer grows with an intrinsic elastic strain determined by the mismatch in lattice parameters. The associated stress in the crystalline layer provides a driving force for the nucleation and motion of defects, primarily dislocations. The focus here is on the glide of a dislocation extending from the free surface of the layer to the layer-substrate interface, the so-called threading dislocation. A general definition of driving force for glide of a threading dislocation is introduced on the basis of work arguments. The definition is then applied to calculate the driving force for steady motion of an isolated threading dislocation in a strained layer, and the result includes Matthews' critical thickness concept as one of its features. Next, a kinetic equation for glide of a dislocation in semiconductor materials is proposed to estimate the glide rate of a threading dislocation in these low mobility materials. Finally, for the case of cubic materials, the general definition of driving force is applied to estimate the additional driving force on a threading dislocation due to an encounter with a dislocation on an intersecting glide plane. The results indicate that this effect is significant in blocking the glide of a threading dislocation for large mismatch strains and for layer thicknesses near the critical thickness.

  12. Epitaxial growth and characterization of thick multi-layer 4H-SiC for very high-voltage insulated gate bipolar transistors

    NASA Astrophysics Data System (ADS)

    Miyazawa, Tetsuya; Nakayama, Koji; Tanaka, Atsushi; Asano, Katsunori; Ji, Shi-yang; Kojima, Kazutoshi; Ishida, Yuuki; Tsuchida, Hidekazu

    2015-08-01

    Techniques to fabricate thick multi-layer 4H-SiC epitaxial wafers were studied for very high-voltage p- and n-channel insulated gate bipolar transistors (IGBTs). Multi-layer epitaxial growth, including a thick p- drift layer (˜180 μm), was performed on a 4H-SiC n+ substrate to form a p-IGBT structure. For an n-IGBT structure, an inverted growth process was employed, in which a thick n- drift layer (˜180 μm) and a thick p++ injector layer (>55 μm) were epitaxially grown. The epitaxial growth conditions were modified to attain a low defect density, a low doping concentration, and a long carrier lifetime in the drift layers. Reduction of the forward voltage drop was attempted by using carrier lifetime enhancement processes, specifically, carbon ion implantation/annealing and thermal oxidation/annealing or hydrogen annealing. Simple PiN diodes were fabricated to demonstrate the effective conductivity modulation in the thick drift layers. The forward voltage drops of the PiN diodes with the p- and n-IGBT structures promise to obtain the extremely low-loss and very high-voltage IGBTs. The change in wafer shape during the processing of the very thick multi-layer 4H-SiC is also discussed.

  13. Improved crystalline properties of laser molecular beam epitaxy grown SrTiO{sub 3} by rutile TiO{sub 2} layer on hexagonal GaN

    SciTech Connect

    Luo, W. B.; Zhu, J.; Chen, H.; Wang, X. P.; Zhang, Y.; Li, Y. R.

    2009-11-15

    Epitaxial SrTiO{sub 3} films were fabricated by laser molecular beam epitaxy on bare and TiO{sub 2} buffered GaN(0002), respectively. The whole deposition processes were in situ monitored by reflection high energy electron diffraction (RHEED). X-ray diffraction (XRD) was carried out to study the growth orientation and crystalline quality of STO films. The interfacial characters and epitaxial relationships were also investigated by high revolution transition electron microscope and selected area electron diffraction (SAED). According to the RHEED observation, the lowest epitaxy temperature of STO on TiO{sub 2} buffered GaN was decreased compared with the direct deposited one. The epitaxial relationship was (111)[110]STO//(0002)[1120]GaN in both cases as confirmed by RHEED, XRD, and SAED. The full width at half maximum of omega-scan and PHI-scan of STO on TiO{sub 2} buffered GaN was reduced compared with that deposited on bare GaN, indicating that epitaxial quality of STO film is improved by inserting TiO{sub 2} layer. In summary, the lattice mismatch was reduced by inserting rutile TiO{sub 2}. As a result, the crystalline temperature was reduced and enhanced epitaxial quality of STO thin film was obtained.

  14. Comparative study of polar and semipolar (112⁻2) InGaN layers grown by metalorganic vapour phase epitaxy

    SciTech Connect

    Dinh, Duc V. E-mail: peter.parbrook@tyndall.ie; Zubialevich, V. Z.; Oehler, F.; Kappers, M. J.; Humphreys, C. J.; Alam, S. N.; Parbrook, P. J. E-mail: peter.parbrook@tyndall.ie; Caliebe, M.; Scholtz, F.

    2014-10-21

    InGaN layers were grown simultaneously on (112⁻2) GaN and (0001) GaN templates by metalorganic vapour phase epitaxy. At higher growth temperature (≥750°C), the indium content (<15%) of the (112⁻2) and (0001) InGaN layers was similar. However, for temperatures less than 750°C, the indium content of the (112⁻2) InGaN layers (15%–26%) were generally lower than those with (0001) orientation (15%–32%). The compositional deviation was attributed to the different strain relaxations between the (112⁻2) and (0001) InGaN layers. Room temperature photoluminescence measurements of the (112⁻2) InGaN layers showed an emission wavelength that shifts gradually from 380 nm to 580 nm with decreasing growth temperature (or increasing indium composition). The peak emission wavelength of the (112⁻2) InGaN layers with an indium content of more than 10% blue-shifted a constant value of ≈(50–60) nm when using higher excitation power densities. This blue-shift was attributed to band filling effects in the layers.

  15. Effect of Ti seed layers on structure of self-organized epitaxial face-centered-cubic-Ag(001) oriented nanodots

    SciTech Connect

    Kamiko, M.; Nose, K.; Suenaga, R.; Kyuno, K.; Koo, J.-W.; Ha, J.-G.

    2013-12-28

    The influence of Ti seed layers on the structure of self-organized Ag nanodots, obtained with a Ti seed-layer-assisted thermal agglomeration method, has been investigated. The samples were grown on MgO(001) single crystal substrates by RF magnetron sputter deposition. The samples were deposited at room temperature and post-annealed at 350 °C for 4 h while maintaining the chamber vacuum conditions. The results of atomic force microscopy (AFM) observations indicated that the insertion of the Ti seed layer (0.6–5.0 nm) between the MgO substrate and Ag layer promotes the agglomeration process, forming the nanodot array. Comparisons between the AFM images revealed that the size of the Ag nanodots was increased with an increase in the Ti seed layer thickness. The atomic concentration of the film surface was confirmed by X-ray photoelectron spectroscopy (XPS). The XPS result suggested that the nanodot surface mainly consisted of Ag. Moreover, X-ray diffraction results proved that the initial deposition of the Ti seed layer (0.6–5.0 nm) onto MgO(001) prior to the Ag deposition yielded high-quality fcc-Ag(001) oriented epitaxial nanodots. The optical absorbance spectra of the fabricated Ag nanodots with various Ti seed layer thicknesses were obtained in the visible light range.

  16. Fabrication of quasi-superlattices at the interface between 3 C-SiC epitaxial layer and substrates of hexagonal SiC polytypes by sublimation epitaxy in vacuum

    NASA Astrophysics Data System (ADS)

    Lebedev, A. A.; Davydov, S. Yu.; Sorokin, L. M.; Shakhov, L. V.

    2015-12-01

    Transmission electron microscopy has been used to study the structure of a transition layer between a hexagonal substrate (6 H-SiC and 4 H-SiC) and a cubic silicon carbide layer grown by sublimation epitaxy in vacuum. It is shown by microdiffraction analysis that the transition layer with a thickness of 210 nm is constituted by alternating layers of cubic (3 C) and hexagonal (6 H) silicon carbide. It is demonstrated that 6 H-SiC/3 C-SiC and 4 H-SiC/3 C-SiC quasi-superlattices can be produced by this method.

  17. Effect of low-temperature annealing on the electronic- and band-structures of (Ga,Mn)As epitaxial layers

    SciTech Connect

    Yastrubchak, O. Gluba, L.; Żuk, J.; Wosinski, T. Andrearczyk, T.; Domagala, J. Z.; Sadowski, J.

    2014-01-07

    The effect of outdiffusion of Mn interstitials from (Ga,Mn)As epitaxial layers, caused by post-growth low-temperature annealing, on their electronic- and band-structure properties has been investigated by modulation photoreflectance (PR) spectroscopy. The annealing-induced changes in structural and magnetic properties of the layers were examined with high-resolution X-ray diffractometry and superconducting quantum interference device magnetometry, respectively. They confirmed an outdiffusion of Mn interstitials from the layers and an enhancement in their hole concentration, which were more efficient for the layer covered with a Sb cap acting as a sink for diffusing Mn interstitials. The PR results demonstrating a decrease in the band-gap-transition energy in the as-grown (Ga,Mn)As layers, with respect to that in the reference GaAs one, are interpreted by assuming a merging of the Mn-related impurity band with the GaAs valence band. Whereas an increase in the band-gap-transition energy caused by the annealing treatment of the (Ga,Mn)As layers is interpreted as a result of annealing-induced enhancement of the free-hole concentration and the Fermi level location within the valence band. The experimental results are consistent with the valence-band origin of itinerant holes mediating ferromagnetic ordering in (Ga,Mn)As, in agreement with the Zener model for ferromagnetic semiconductors.

  18. Depth-dependent phase change in Gd{sub 2}O{sub 3} epitaxial layers under ion irradiation

    SciTech Connect

    Mejai, N.; Debelle, A. Thomé, L.; Sattonnay, G.; Gosset, D.; Dargis, R.; Clark, A.

    2015-09-28

    Epitaxial Gd{sub 2}O{sub 3} thin layers with the cubic structure were irradiated with 4-MeV Au{sup 2+} ions in the 10{sup 13}–10{sup 15} cm{sup −2} fluence range. X-ray diffraction indicates that ion irradiation induces a cubic to monoclinic phase change. Strikingly, although the energy-deposition profile of the Au{sup 2+} ions is constant over the layer thickness, this phase transformation is depth-dependent, as revealed by a combined X-ray diffraction and ion channeling analysis. In fact, the transition initiates very close to the surface and propagates inwards, which can be explained by an assisted migration process of irradiation-induced defects. This result is promising for developing a method to control the thickness of the rare-earth oxide crystalline phases.

  19. Investigation of the asymmetric misfit dislocation morphology in epitaxial layers with the zinc-blende structure

    NASA Technical Reports Server (NTRS)

    Fox, Bradley A.; Jesser, William A.

    1990-01-01

    The source of the asymmetry in the dislocation morphology exhibited in the epitaxial growth of compound semiconductors on (100) was investigated. A thickness wedge of p- and n-type GaAs(0.95)P(0.05) was grown on GaAs by metalorganic chemical vapor deposition, and the effect of misorientation on the resolved shear stress for each slip system was calculated and eliminated as the source of the asymmetry. Another potential source of asymmetry, the thickness gradient, was also eliminated. Results show that the substrate misorientation and the thickness gradient do not significantly contribute to the asymmetry and that the dominant contributor to the asymmetry of misfit dislocations in the (001) epitaxial interface can be attributed to the differences in the Peierls barriers between the two types of dilocations in GaAsP/GaAs.

  20. Epitaxial layers of 2122 BCSCO superconductor thin films having single crystalline structure

    NASA Technical Reports Server (NTRS)

    Pandey, Raghvendra K. (Inventor); Raina, Kanwal K. (Inventor); Solayappan, Narayanan (Inventor)

    1995-01-01

    A substantially single phase, single crystalline, highly epitaxial film of Bi.sub.2 CaSr.sub.2 Cu.sub.2 O.sub.8 superconductor which has a T.sub.c (zero resistance) of 83K is provided on a lattice-matched substrate with no intergrowth. This film is produced by a Liquid Phase Epitaxy method which includes the steps of forming a dilute supercooled molten solution of a single phase superconducting mixture of oxides of Bi, Ca, Sr, and Cu having an atomic ratio of about 2:1:2:2 in a nonreactive flux such as KCl, introducing the substrate, e.g., NdGaO.sub.3, into the molten solution at 850.degree. C., cooling the solution from 850.degree. C. to 830.degree. C. to grow the film and rapidly cooling the substrate to room temperature to maintain the desired single phase, single crystalline film structure.

  1. Threading dislocations in GaAs epitaxial layers on various thickness Ge buffers on 300 mm Si substrates

    NASA Astrophysics Data System (ADS)

    Bogumilowicz, Y.; Hartmann, J. M.; Rochat, N.; Salaun, A.; Martin, M.; Bassani, F.; Baron, T.; David, S.; Bao, X.-Y.; Sanchez, E.

    2016-11-01

    We have grown GaAs epitaxial layers on Ge buffers, themselves on Si (001) substrates, using an Applied Materials 300 mm metal organic chemical vapor deposition tool. We varied the Ge buffer thickness between 0.36 and 1.38 μm and studied the properties of a 0.27 μm thick GaAs layer on top. We found that increasing the Ge buffer thickness yielded smoother GaAs films with an rms surface roughness as low as 0.5 nm obtained on a 5×5 μm2 area. The bow of the substrate increased following a linear law with the epitaxial stack thickness up to 240 μm for a 1.65 μm stack. We have also characterized the threading dislocations present in the GaAs layers using X-ray diffraction and cathodoluminescence. Increasing the Ge buffer thickness resulted in lower threading dislocation densities, enabling us to obtain anti-phase boundary - free GaAs films with a threading dislocation density as low as 3×107 cm-2. In addition, atomic force microscopy surface topology measurements showed the presence of pits in the GaAs layers whose density agreed well with other threading dislocation density assessments. It thus seems that threading dislocations can in certain cases induce some growth rate variations, making them visible in as-grown GaAs films. Using thicker Ge buffers results in smoother films with less threading dislocations, with the side effect of increasing the bow on the wafer. If bow is not an issue, this is a practical approach to improve the GaAs (on Ge buffer) on silicon quality.

  2. Band lineup in GaAs(1-x)Sbx/GaAs strained-layer multiple quantum wells grown by molecular-beam epitaxy

    NASA Technical Reports Server (NTRS)

    Ji, G.; Agarwala, S.; Huang, D.; Chyi, J.; Morkoc, H.

    1988-01-01

    GaAs(1-x)Sbx/GaAs strained-layer multiple quantum wells have been grown by molecular-beam epitaxy and characterized by room-temperature photoreflectance (PR). The PR spectra denote that high-quality layers can be grown in the GaAs(1-x)Sbx/GaAs system. The method for determining the band offset Q(vh) is discussed in this strained-layer system.

  3. Nanometer-Scale Epitaxial Strain Release in Perovskite Heterostructures Using 'SrAlOx' Sliding Buffer Layers

    SciTech Connect

    Bell, Christopher

    2011-08-11

    We demonstrate the strain release of LaAlO{sub 3} epitaxial film on SrTiO{sub 3} (001) by inserting ultra-thin 'SrAlO{sub x}' buffer layers. Although SrAlO{sub x} is not a perovskite, nor stable as a single phase in bulk, epitaxy stabilizes the perovskite structure up to a thickness of 2 unit cells (uc). At a critical thickness of 3 uc of SrAlO{sub x}, the interlayer acts as a sliding buffer layer, and abruptly relieves the lattice mismatch between the LaAlO{sub 3} filmand the SrTiO{sub 3} substrate, while maintaining crystallinity. This technique may provide a general approach for strain relaxation of perovskite film far below the thermodynamic critical thickness. A central issue in heteroepitaxial filmgrowth is the inevitable difference in lattice constants between the filmand substrate. Due to this lattice mismatch, thin film are subjected to microstructural strain, which can have a significan effect on the filmproperties. This challenge is especially prominent in the rapidly developing fiel of oxide electronics, where much interest is focused on incorporating the emergent physical properties of oxides in devices. Although strain can be used to great effect to engineer unusual ground states, it is often deleterious for bulk first-orde phase transitions, which are suppressed by the strain and symmetry constraints of the substrate. While there are some reports discussing the control of the lattice mismatch in oxides using thick buffer layers, the materials choice, lattice-tunable range, and control of misfit dislocations are still limited. In this Letter, we report the fabrication of strain-relaxed LaAlO{sub 3} (LAO) thin film on SrTiO{sub 3} (STO) (001) using very thin 'SrAlO{sub x}' (SAO) buffer layers. Whereas for 1 or 2 pseudo-perovskite unit cells (uc) of SAO, the subsequent LAO filmis strained to the substrate, at a critical thickness of 3 uc the SAO interlayer abruptly relieves the lattice mismatch between the LAO and the STO, although maintaining the

  4. Oxygen Impurities and Defects in Epitaxial Layer SiC and SiC Wafer Characterized by Room and Low Temperatures FTIR

    NASA Technical Reports Server (NTRS)

    Lu, W. J.; Collins, W. E.; Shi, D. T.; Tung, Y. S.; Larkin, D. J.

    1998-01-01

    SiC as a highly promising semiconducting material has received increasing attention in the last decade. The impurities such as oxygen and hydrogen have a great effect in electronic properties of semiconducting materials. In this study, the FTIR spectra were measured at room temperature (25 C) and low temperature (-70 C) for an n-type SiC substrate, a p-type epitaxial layer SiC, and patterned Ta on a p-type epitaxial layer SiC sample. The oxygen related IR peaks were measured for all three samples at room and low temperatures. The peak at 1105 cm(exp -1) is the result of a substitutional carbon and a interstitial oxygen in SiC. The concentration of the impurity oxygen increases in the SiC epitaxial layer during the CVD and electron beam processes. For the n-type SiC substrate, this peak does not appear. The peak at 905 cm(exp -1) exists in the IR spectra only for two epitaxial layer on p-type SiC substrate samples. This peak is related to oxygen vacancy centers in SiC, which are introduced in the CVD epitaxial growth process. At low temperature, the peak at 1105 cm(exp -1) shifts down and the peak at 905 cm(exp -1) shifts up for the epitaxial layer SiC samples. It can be explained that, at low temperatures, the stress increases due to the distorted bonds. The study shows that FTIR is a very effective method to evaluate low concentration impurities in SiC.

  5. Epitaxial Growth of Thin Ferroelectric Polymer Films on Graphene Layer for Fully Transparent and Flexible Nonvolatile Memory.

    PubMed

    Kim, Kang Lib; Lee, Wonho; Hwang, Sun Kak; Joo, Se Hun; Cho, Suk Man; Song, Giyoung; Cho, Sung Hwan; Jeong, Beomjin; Hwang, Ihn; Ahn, Jong-Hyun; Yu, Young-Jun; Shin, Tae Joo; Kwak, Sang Kyu; Kang, Seok Ju; Park, Cheolmin

    2016-01-13

    Enhancing the device performance of organic memory devices while providing high optical transparency and mechanical flexibility requires an optimized combination of functional materials and smart device architecture design. However, it remains a great challenge to realize fully functional transparent and mechanically durable nonvolatile memory because of the limitations of conventional rigid, opaque metal electrodes. Here, we demonstrate ferroelectric nonvolatile memory devices that use graphene electrodes as the epitaxial growth substrate for crystalline poly(vinylidene fluoride-trifluoroethylene) (PVDF-TrFE) polymer. The strong crystallographic interaction between PVDF-TrFE and graphene results in the orientation of the crystals with distinct symmetry, which is favorable for polarization switching upon the electric field. The epitaxial growth of PVDF-TrFE on a graphene layer thus provides excellent ferroelectric performance with high remnant polarization in metal/ferroelectric polymer/metal devices. Furthermore, a fully transparent and flexible array of ferroelectric field effect transistors was successfully realized by adopting transparent poly[bis(4-phenyl)(2,4,6-trimethylphenyl)amine] semiconducting polymer.

  6. Photoluminescence study on heavily donor and acceptor impurity doped GaAs layers grown by molecular-beam epitaxy

    SciTech Connect

    Islam, A. Z. M. Touhidul; Jung, D. W.; Noh, J. P.; Otsuka, N.

    2009-05-01

    Gallium arsenide layers doped with high concentrations of Be and Si by molecular-beam epitaxy are studied by photoluminescence (PL) spectroscopy. PL peaks from doped layers are observed at energies significantly lower than the band-gap of GaAs. The growth and doping conditions suggest that the origin of these peaks is different from that of low energy PL peaks, which were observed in earlier studies and attributed to impurity-vacancy complexes. The dependence of the peak energy on the temperature and the annealing is found to differ from that of the peaks attributed to impurity-vacancy complexes. On the basis of these observations, it is suggested that the low energy peaks are attributed to short range ordered arrangements of impurity ions. This possibility is examined by calculations of the PL spectra with models of pairs of acceptor and donor delta-doped layers and PL experiments of a superlattice of pairs of Be and Si delta-doped layers.

  7. Growth optimization and applicability of thick on-axis SiC layers using sublimation epitaxy in vacuum

    NASA Astrophysics Data System (ADS)

    Jokubavicius, Valdas; Sun, Jianwu; Liu, Xinyu; Yazdi, Gholamreza; Ivanov, Ivan. G.; Yakimova, Rositsa; Syväjärvi, Mikael

    2016-08-01

    We demonstrate growth of thick SiC layers (100-200 μm) on nominally on-axis hexagonal substrates using sublimation epitaxy in vacuum (10-5 mbar) at temperatures varying from 1700 to 1975 °C with growth rates up to 270 μm/h and 70 μm/h for 6H- and 4H-SiC, respectively. The stability of hexagonal polytypes are related to process growth parameters and temperature profile which can be engineered using different thermal insulation materials and adjustment of the induction coil position with respect to the graphite crucible. We show that there exists a range of growth rates for which single-hexagonal polytype free of foreign polytype inclusions can be maintained. Further on, foreign polytypes like 3C-SiC can be stabilized by moving out of the process window. The applicability of on-axis growth is demonstrated by growing a 200 μm thick homoepitaxial 6H-SiC layer co-doped with nitrogen and boron in a range of 1018 cm-3 at a growth rate of about 270 μm/h. Such layers are of interest as a near UV to visible light converters in a monolithic white light emitting diode concept, where subsequent nitride-stack growth benefits from the on-axis orientation of the SiC layer.

  8. Substrate Structures For Growth Of Highly Oriented And/Or Epitaxial Layers Thereon

    DOEpatents

    Arendt, Paul N.; Foltyn, Stephen R.; Groves, James R.; Jia, Quanxi

    2005-07-26

    A composite substrate structure including a substrate, a layer of a crystalline metal oxide or crystalline metal oxynitride material upon the substrate, a layer of an oriented cubic oxide material having a rock-salt-like structure upon the crystalline metal oxide or crystalline metal oxynitride material layer is provided together with additional layers such as one or more layers of a buffer material upon the oriented cubic oxide material layer. Jc's of 2.3×106 A/cm2 have been demonstrated with projected Ic's of 320 Amperes across a sample 1 cm wide for a superconducting article including a flexible polycrystalline metallic substrate, an inert oxide material layer upon the surface of the flexible polycrystalline metallic substrate, a layer of a crystalline metal oxide or crystalline metal oxynitride material upon the layer of the inert oxide material, a layer of an oriented cubic oxide material having a rock-salt-like structure upon the crystalline metal oxide or crystalline metal oxynitride material layer, a layer of a buffer material upon the oriented cubic oxide material layer, and, a top-layer of a high temperature superconducting material upon the layer of a buffer material.

  9. Epitaxial synthesis of diamond layers on a monocrystalline diamond substrate in a torch microwave plasmatron

    SciTech Connect

    Sergeichev, K. F. Lukina, N. A.

    2011-12-15

    The epitaxial growth of a diamond single-crystal film in a torch microwave discharge excited by a magnetron of a domestic microwave oven with the power of {<=}1 kW in an argon-hydrogen-methane mixture with a high concentration of methane (up to 25% with respect to hydrogen) at atmospheric pressure on a sub-strate of a synthetic diamond single crystal (HPHP) with the orientation (100) and 4 Multiplication-Sign 4 mm in size is obtained. A discharge with the torch diameter of {approx}2 mm and the concentration of the microwave power absorbed in the torch volume of >10{sup 3} W/cm{sup 3} is shown to be effective for epitaxial enlargement of a single crystal of synthetic diamond. The structure of the deposited film with the thickness up to 10 {mu}m with high-quality morphology is investigated with an optical microscope as well as using the methods of the Raman scattering and scanning electron microscopy.

  10. Novel neutral under layer materials to enhance the photolithography performance and defectivity for chemo-epitaxy process

    NASA Astrophysics Data System (ADS)

    Mizuochi, Ryuta; Wakayama, Hiroyuki; Someya, Yasunobu; Sakamoto, Rikimaru

    2016-03-01

    Neutral layer (NL) material is one of the key materials for aligning block-co-polymer (BCP). In this study, NLs were designed and investigated, which have the capability to enhance the photo-lithography performance, a good alignment performance of BCP, and reduce the defectivity after chemo-epitaxy process. In order to enhance the photo-lithography performance, some new polymers were prepared with chromophores to control n/k value and adhesive unit interacted with the photo resist. The surface energy of these materials was adjusted to the neutral for BCP by controlling the ratio of chromophore and adhesion unit. The defects were also investigated and achieved low defectivity by optimized materials. Since this material has the above properties, it shows a good perpendicularly alignment pattern of BCP and a photolithography performance.

  11. Surface structure and surface kinetics of InN grown by plasma-assisted atomic layer epitaxy: A HREELS study

    SciTech Connect

    Acharya, Ananta R. E-mail: anantaach@gmail.com; Thoms, Brian D.; Nepal, Neeraj; Eddy, Charles R.

    2015-03-15

    The surface bonding configuration and kinetics of hydrogen desorption from InN grown by plasma-assisted atomic layer epitaxy have been investigated. High resolution electron energy loss spectra exhibited loss peaks assigned to a Fuchs–Kliewer surface phonon, N-N and N-H surface species. The surface N-N vibrations are attributed to surface defects. The observation of N-H but no In-H surface species suggested N-terminated InN. Isothermal desorption data were best fit by the first-order desorption kinetics with an activation energy of (0.88 ± 0.06) eV and pre-exponential factor of (1.5 ± 0.5) × 10{sup 5 }s{sup −1}.

  12. High quality InAlN single layers lattice-matched to GaN grown by molecular beam epitaxy

    SciTech Connect

    Gacevic, Z.; Fernandez-Garrido, S.; Calleja, E.; Estrade, S.

    2011-07-18

    We report on properties of high quality {approx}60 nm thick InAlN layers nearly in-plane lattice-matched to GaN, grown on c-plane GaN-on-sapphire templates by plasma-assisted molecular beam epitaxy. Excellent crystalline quality and low surface roughness are confirmed by X-ray diffraction, transmission electron microscopy, and atomic force microscopy. High annular dark field observations reveal a periodic in-plane indium content variation (8 nm period), whereas optical measurements evidence certain residual absorption below the band-gap. The indium fluctuation is estimated to be {+-} 1.2% around the nominal 17% indium content via plasmon energy oscillations assessed by electron energy loss spectroscopy with sub-nanometric spatial resolution.

  13. Surface and defect correlation studies on high resistivity 4H SiC bulk crystals and epitaxial layers for radiation detectors

    NASA Astrophysics Data System (ADS)

    Mandal, Krishna C.; Muzykov, Peter G.; Krishna, Ramesh M.; Hayes, Timothy C.

    2011-09-01

    Radiation detectors have been fabricated using bulk semi-insulating (SI) 4H-SiC crystals and SI and n-type 4H-SiC epitaxial layers grown by chemical vapor deposition (CVD) on highly doped (0001) 4H-SiC substrates. The devices have been characterized by optical microscopy, current-voltage (I-V) measurements, thermally stimulated current (TSC) spectroscopy (94K - 650 K), Hall effect, van der Pauw measurements, and electron beam induced current (EBIC) technique. Both epitaxial layers exhibited relatively shallow levels related to Al, B, L- and D- centers. Deep level centers in the n-type epitaxial layer peaked at ~ 400 K (Ea ~ 1.1 eV) and ~ 470 K were correlated with IL2 defect and 1.1 eV center in high purity bulk SI 4H-SiC. The SI epitaxial layer exhibited peak at ~ 290 K (Ea = 0.82 - 0.87 eV) that was attributed to IL1 center and 3C inclusions, and at ~ 525 K that was related to intrinsic defects and their complexes with energy levels close to the middle of the band gap. The TSC spectra of the SI epitaxial layer exhibited peaks with different current polarity which we attributed to the built-in electric field reversal. Results of EBIC and optical microscopy characterization showed segregation of threading dislocations around comet tail defects in the n-type epitaxial layers and presence of stacking faults and 3C-SiC inclusions in both epitaxial layers. The I-V characteristics of the devices on SI epi obtained in wide temperature range (94K - 650 K) exhibited steps at ~ 1 V and ~ 70 V corresponding to the ultimate trap filling of deep centers peaked at > 500 K and at ~ 250 K (Ea ~ 0.57 eV), & ~ 300 K (Ea ~ 0.85 eV) respectively. Slow processes of the injected carrier capture on traps resulted in the I-V characteristic with negative differential resistance (NDR). The high temperature resistivity measurements of bulk SI 4H-SiC sample revealed resistivity hysteresis that was attributed to the filling of the deep level electron trap centers.

  14. Epitaxial strontium titanate films grown by atomic layer deposition on SrTiO{sub 3}-buffered Si(001) substrates

    SciTech Connect

    McDaniel, Martin D.; Posadas, Agham; Ngo, Thong Q.; Dhamdhere, Ajit; Smith, David J.; Demkov, Alexander A.; Ekerdt, John G.

    2013-01-15

    Epitaxial strontium titanate (STO) films have been grown by atomic layer deposition (ALD) on Si(001) substrates with a thin STO buffer layer grown by molecular beam epitaxy (MBE). Four unit cells of STO grown by MBE serve as the surface template for ALD growth. The STO films grown by ALD are crystalline as-deposited with minimal, if any, amorphous SiO{sub x} layer at the STO-Si interface. The growth of STO was achieved using bis(triisopropylcyclopentadienyl)-strontium, titanium tetraisopropoxide, and water as the coreactants at a substrate temperature of 250 Degree-Sign C. In situ x-ray photoelectron spectroscopy (XPS) analysis revealed that the ALD process did not induce additional Si-O bonding at the STO-Si interface. Postdeposition XPS analysis also revealed sporadic carbon incorporation in the as-deposited films. However, annealing at a temperature of 250 Degree-Sign C for 30 min in moderate to high vacuum (10{sup -6}-10{sup -9} Torr) removed the carbon species. Higher annealing temperatures (>275 Degree-Sign C) gave rise to a small increase in Si-O bonding, as indicated by XPS, but no reduced Ti species were observed. X-ray diffraction revealed that the as-deposited STO films were c-axis oriented and fully crystalline. A rocking curve around the STO(002) reflection gave a full width at half maximum of 0.30 Degree-Sign {+-} 0.06 Degree-Sign for film thicknesses ranging from 5 to 25 nm. Cross-sectional transmission electron microscopy revealed that the STO films were continuous with conformal growth to the substrate and smooth interfaces between the ALD- and MBE-grown STO. Overall, the results indicate that thick, crystalline STO can be grown on Si(001) substrates by ALD with minimal formation of an amorphous SiO{sub x} layer using a four-unit-cell STO buffer layer grown by MBE to serve as the surface template.

  15. Kinetic limitation of chemical ordering in Bi2Te3-x Se x layers grown by molecular beam epitaxy.

    PubMed

    Schreyeck, S; Brunner, K; Kirchner, A; Bass, U; Grauer, S; Schumacher, C; Gould, C; Karczewski, G; Geurts, J; Molenkamp, L W

    2016-04-13

    We study the chemical ordering in Bi2Te3-x Se x grown by molecular beam epitaxy on Si substrates. We produce films in the full composition range from x = 0 to 3, and determine their material properties using energy dispersive x-ray spectroscopy, x-ray diffraction and Raman spectroscopy. By fitting the parameters of a kinetic growth model to these results, we obtain a consistent description of growth at a microscopic level. Our main finding is that despite the incorporation of Se in the central layer being much more probable than that of Te, the formation of a fully ordered Te-Bi-Se-Bi-Te layer is prevented by kinetic of the growth process. Indeed, the Se concentration in the central layer of Bi2Te2Se1 reaches a maximum of only ≈ 75% even under ideal growth conditions. A second finding of our work is that the intensity ratio of the 0 0 12 and 0 0 6 x-ray reflections serves as an experimentally accessible quantitative measure of the degree of ordering in these films.

  16. High performance LiMn2O4 cathode materials grown with epitaxial layered nanostructure for Li-ion batteries.

    PubMed

    Lee, Min-Joon; Lee, Sanghan; Oh, Pilgun; Kim, Youngsik; Cho, Jaephil

    2014-02-12

    Tremendous research works have been done to develop better cathode materials for a large scale battery to be used for electric vehicles (EVs). Spinel LiMn2O4 has been considered as the most promising cathode among the many candidates due to its advantages of high thermal stability, low cost, abundance, and environmental affinity. However, it still suffers from the surface dissolution of manganese in the electrolyte at elevated temperature, especially above 60 °C, which leads to a severe capacity fading. To overcome this barrier, we here report an imaginative material design; a novel heterostructure LiMn2O4 with epitaxially grown layered (R3̅m) surface phase. No defect was observed at the interface between the host spinel and layered surface phase, which provides an efficient path for the ionic and electronic mobility. In addition, the layered surface phase protects the host spinel from being directly exposed to the highly active electrolyte at 60 °C. The unique characteristics of the heterostructure LiMn2O4 phase exhibited a discharge capacity of 123 mAh g(-1) and retained 85% of its initial capacity at the elevated temperature (60 °C) after 100 cycles.

  17. Kinetic limitation of chemical ordering in Bi2Te3-x Se x layers grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Schreyeck, S.; Brunner, K.; Kirchner, A.; Bass, U.; Grauer, S.; Schumacher, C.; Gould, C.; Karczewski, G.; Geurts, J.; Molenkamp, L. W.

    2016-04-01

    We study the chemical ordering in Bi2Te3-x Se x grown by molecular beam epitaxy on Si substrates. We produce films in the full composition range from x  =  0 to 3, and determine their material properties using energy dispersive x-ray spectroscopy, x-ray diffraction and Raman spectroscopy. By fitting the parameters of a kinetic growth model to these results, we obtain a consistent description of growth at a microscopic level. Our main finding is that despite the incorporation of Se in the central layer being much more probable than that of Te, the formation of a fully ordered Te-Bi-Se-Bi-Te layer is prevented by kinetic of the growth process. Indeed, the Se concentration in the central layer of Bi2Te2Se1 reaches a maximum of only  ≈75% even under ideal growth conditions. A second finding of our work is that the intensity ratio of the 0 0 12 and 0 0 6 x-ray reflections serves as an experimentally accessible quantitative measure of the degree of ordering in these films.

  18. Structural properties of maskless epitaxial lateral overgrown MOCVD GaN layers on Si (1 1 1) substrates

    NASA Astrophysics Data System (ADS)

    Haffouz, S.; Grzegorczyk, A.; Hageman, P. R.; Vennégu≐s, P.; van der Drift, E. W. J. M.; Larsen, P. K.

    2003-02-01

    We report on the maskless epitaxial lateral overgrowth of GaN on structured Si (1 1 1) substrates and on its structural properties using transmission electron microscopy and photo-electrochemical (PEC) etching techniques. The structured silicon substrates are achieved using photolithography and dry etching; 4-μm-deep holes of 1.5 μm in diameter, each separated by 2.5 μm, are etched in the (1 1 1) Si surface. The growth process is started by depositing a 10-nm-thick AlN buffer layer at 850°C and then followed by the growth at high temperature (1170°C) of the GaN epilayer. The deposition of GaN takes place first on the Si (1 1 1) surface covered with AlN in between the holes, i.e. no deposits are formed in the holes. During the growth the GaN layer extends vertically and laterally over the holes until complete coalescence. Transmission electron microscopy shows that regions over the holes only contain dislocations in the basal plane resulting from the bending of dislocations nucleated at the Si/AlN interface and at the coalescence boundary between the two laterally overgrown layers. This results in a drastic decrease of dislocation density in these areas of the films. The revelation of dislocations is also achieved by PEC etching technique.

  19. Features of molecular beam epitaxy of the GaN (0001) and GaN (0001-bar) layers with the use of different methods of activation of nitrogen

    SciTech Connect

    Mizerov, A. M. Jmerik, V. N.; Kaibyshev, V. K.; Komissarova, T. A.; Masalov, S. A.; Ivanov, S. V.

    2009-08-15

    The results of comparative studies of the growth kinetics of the GaN layers of different polarity during ammonia molecular beam epitaxy and plasma-assisted molecular beam epitaxy (PA MBE) of nitrogen with the use of sapphire substrates and GaN(0001-bar)/c-Al{sub 2}O{sub 3} templates grown by gas-phase epitaxy from metalorganic compounds are presented. The possibility is shown of obtaining the GaN layers with an atomically smooth surface during molecular beam epitaxy with plasma activation of nitrogen. For this purpose, it is suggested to carry out the growth in conditions enriched with metal near the mode of formation of the Ga drops at a temperature close to the decomposition temperature of GaN (TS {approx} 760 deg. C). The conclusion is made that an increase in the growth temperature positively affects the structural, optical, and electrical properties of the GaN (0001-bar) layers. A high quality of the GaN (0001) films grown by the PA MBE method at a low temperature of {approx}700 deg. C on the GaN/c-Al{sub 2}O{sub 3} templates is shown.

  20. Structural properties of relaxed thin film germanium layers grown by low temperature RF-PECVD epitaxy on Si and Ge (100) substrates

    SciTech Connect

    Cariou, R.; Ruggeri, R.; Tan, X.; Nassar, J.; Roca i Cabarrocas, P.; Mannino, Giovanni

    2014-07-15

    We report on unusual low temperature (175 °C) heteroepitaxial growth of germanium thin films using a standard radio-frequency plasma process. Spectroscopic ellipsometry and transmission electron microscopy (TEM) reveal a perfect crystalline quality of epitaxial germanium layers on (100) c-Ge wafers. In addition direct germanium crystal growth is achieved on (100) c-Si, despite 4.2% lattice mismatch. Defects rising from Ge/Si interface are mostly located within the first tens of nanometers, and threading dislocation density (TDD) values as low as 10{sup 6} cm{sup −2} are obtained. Misfit stress is released fast: residual strain of −0.4% is calculated from Moiré pattern analysis. Moreover we demonstrate a striking feature of low temperature plasma epitaxy, namely the fact that crystalline quality improves with thickness without epitaxy breakdown, as shown by TEM and depth profiling of surface TDD.

  1. Seeding Atomic Layer Deposition of High-k Dielectrics on Epitaxial Graphene with Organic Self-assembled Monolayers

    SciTech Connect

    Alaboson, Justice M. P.; Wang, Qing Hua; Emery, Jonathan D.; Lipson, Albert L.; Bedzyk, Michael J.; Elam, Jeffrey W.; Pellin, Michael J.; Hersam, Mark C.

    2011-06-28

    The development of high-performance graphene-based nanoelectronics requires the integration of ultrathin and pinhole-free high-k dielectric films with graphene at the wafer scale. Here, we demonstrate that self-assembled monolayers of perylene-3,4,9,10-tetracarboxylic dianhydride (PTCDA) act as effective organic seeding layers for atomic layer deposition (ALD) of HfO₂ and Al₂O₃ on epitaxial graphene on SiC(0001). The PTCDA is deposited via sublimation in ultrahigh vacuum and shown to be highly ordered with low defect density by molecular-resolution scanning tunneling microscopy. Whereas identical ALD conditions lead to incomplete and rough dielectric deposition on bare graphene, the chemical functionality provided by the PTCDA seeding layer yields highly uniform and conformal films. The morphology and chemistry of the dielectric films are characterized by atomic force microscopy, ellipsometry, cross-sectional scanning electron microscopy, and X-ray photoelectron spectroscopy, while high-resolution X-ray reflectivity measurements indicate that the underlying graphene remains intact following ALD. Using the PTCDA seeding layer, metal-oxide-graphene capacitors fabricated with a 3 nm Al₂O₃ and 10 nm HfO₂ dielectric stack show high capacitance values of ~700 nF/cm² and low leakage currents of ~5 × 10{sup –9} A/cm² at 1 V applied bias. These results demonstrate the viability of sublimated organic self-assembled monolayers as seeding layers for high-k dielectric films in graphene-based nanoelectronics.

  2. Comparative study of single InGaN layers grown on Si(111) and GaN(0001) templates: The role of surface wetting and epitaxial constraint

    NASA Astrophysics Data System (ADS)

    Gómez, V. J.; Gačević, Ž.; Soto-Rodríguez, P. E. D.; Aseev, P.; Nötzel, R.; Calleja, E.; Sánchez-García, M. A.

    2016-08-01

    This work presents a comparative study, based mainly on X-ray diffraction analysis, of compact (~100 nm thick) and uniform single crystal InGaN layers (In content <35%) grown by plasma-assisted molecular beam epitaxy. InGaN layers have been grown directly on Si(111) substrates and on commercially available GaN(0001)-on-sapphire templates.. A high reactivity of atomic N with Si leads to a formation of amorphous SiN on Si substrate, i.e. an indirect crystal-to-crystal InGaN/SiN/Si contact; the weak InGaN interaction with the underlying substrate (weak epitaxial constraint) further leads to poor surface "wetting" and consequent 3D nucleation. The InGaN growth on GaN is, on the other hand, characterized by a direct crystal-to-crystal InGaN/GaN contact; the strong InGaN interaction with the underlying substrate (strong epitaxial constraint) leads to good surface "wetting" and consequent 2D nucleation. All studied InGaN layers show single epitaxial relationship to both Si(111) and GaN(0001)-on-sapphire substrates as well as a relatively good compositional uniformity (no trace of InGaN phase separation). However, layers grown on Si show significantly lower strain and inferior crystallographic uniformity i.e. higher disorder in crystallographic tilt and twist. The surface "wetting" (poor vs. good) and epitaxial constraint (weak vs. strong) are suggested as the main origins of these discrepancies.

  3. Atomic layer-by-layer growth of superconducting Bi Sr Ca Cu O thin films by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Bove, P.; Rogers, D. J.; Hosseini Teherani, F.

    2000-11-01

    In situ reflection high-energy electron diffraction (RHEED) is employed to investigate the growth kinetics, and monitor the crystal surface evolution, during plasma-assisted molecular beam epitaxy growth of Bi 2Sr 2Ca n-1 Cu nO (BSCCO) compounds. By varying the growth parameters such as operating pressure, substrate temperature, cation flux and shutter opening pulse duration, it is found that the crystal growth front exhibits surface reconstructions with (1×1), (2×2), c(2×2) and (3×1) symmetries for the Sr, Ca and Cu species, and a RHEED pattern characteristic of twinning for Bi. Through manipulation of these surface reconstructions, and use of an adapted growth mode, it was possible to achieve a monolayer coverage for each species supplied. For the n=1, 2 and 3 compounds the resulting films exhibit a crystal quality characterised by an X-ray diffraction rocking curve width of 0.03° and an atomic force microscope mean surface roughness of 0.9 nm [over 10×10 μm] for 40 nm thick films.

  4. van der Waals Epitaxy of MoS2 Layers Using Graphene As Growth Templates

    SciTech Connect

    Shi, Yumeng; Zhou, Wu; Lu, Ang-Yu; Fang, Wenjing; Lee, Yi-Hsien; Hsu, Allen Long; Kim, Soo Min; Kim, Ki Kang; Yang, Hui Ying; Liang, Lain-Jong; Idrobo Tapia, Juan C; Kong, Jing

    2012-01-01

    We present a method for synthesizing MoS{sub 2}/Graphene hybrid heterostructures with a growth template of graphene-covered Cu foil. Compared to other recent reports, a much lower growth temperature of 400 C is required for this procedure. The chemical vapor deposition of MoS{sub 2} on the graphene surface gives rise to single crystalline hexagonal flakes with a typical lateral size ranging from several hundred nanometers to several micrometers. The precursor (ammonium thiomolybdate) together with solvent was transported to graphene surface by a carrier gas at room temperature, which was then followed by post annealing. At an elevated temperature, the precursor self-assembles to form MoS{sub 2} flakes epitaxially on the graphene surface via thermal decomposition. With higher amount of precursor delivered onto the graphene surface, a continuous MoS{sub 2} film on graphene can be obtained. This simple chemical vapor deposition method provides a unique approach for the synthesis of graphene heterostructures and surface functionalization of graphene. The synthesized two-dimensional MoS{sub 2}/Graphene hybrids possess great potential toward the development of new optical and electronic devices as well as a wide variety of newly synthesizable compounds for catalysts.

  5. Electrical Properties Of GaN Layers Grown By Metal Organic Vapor Phase Epitaxy (MOVPE)

    NASA Astrophysics Data System (ADS)

    Rangel-Kuoppa, Victor-Tapio; Aguilar, Cesia Guarneros; Sánchez-Reséndiz, Victor

    2011-12-01

    The electrical properties of three un-doped GaN samples grown at low pressure by Metal Organic Vapor Phase Epitaxy (MOVPE) on sapphire substrates are reported. Two different growth temperatures of 900 °C and 950 °C were used, for 90 min. Also, two trimethylgallium flow fluxes were set (5.39 μmole/minute and 8.39 μmole/minute). The temperature dependent Hall (T-Hall) technique was used, between 35 K and 373 K. The resistivity of our samples fluctuated between 3 and 24 mΩ×cm. They were temperature dependent and were explained by two thermally activated processes, with activation energies of 20 and 70 meV. For the two samples grown at 900 °C, the mobilities and the charge carrier densities were temperature independent with values of 10 and 20 cm2 V-1 s-1, and 6×1019 and 5×1019 cm-3, respectively. For the sample grown at 950 °C, the mobility showed temperature dependence to the power of +1/3 and the charge carrier density a thermally activated dependence with an activation energy of 5 meV.

  6. Aqueous phase synthesis of upconversion nanocrystals through layer-by-layer epitaxial growth for in vivo X-ray computed tomography.

    PubMed

    Li, Feifei; Li, Chunguang; Liu, Jianhua; Liu, Xiaomin; Zhao, Lan; Bai, Tianyu; Yuan, Qinghai; Kong, Xianggui; Han, Yu; Shi, Zhan; Feng, Shouhua

    2013-08-01

    Lanthanide-doped core-shell upconversion nanocrystals (UCNCs) have tremendous potential for applications in many fields, especially in bio-imaging and medical therapy. As core-shell UCNCs are mostly synthesized in organic solvents, tedious organic-aqueous phase transfer processes are usually needed for their use in bio-applications. Herein, we demonstrate the first example of one-step synthesis of highly luminescent core-shell UCNCs in the "aqueous" phase under mild conditions using innocuous reagents. A microwave-assisted approach allowed for layer-by-layer epitaxial growth of a hydrophilic NaGdF4 shell on NaYF4:Yb, Er cores. During this process, surface defects of the nanocrystals could be gradually passivated by the homogeneous shell deposition, resulting in obvious enhancement in the overall upconversion emission efficiency. In addition, the up-down conversion dual-mode luminescent NaYF4:Yb, Er@NaGdF4:Ce, Ln (Eu, Tb, Sm, Dy) nanocrystals were also synthesized to further validate the successful formation of the core-shell structure. More significantly, based on their superior solubility and stability in water solution, high upconversion efficiency and Gd-doped predominant X-ray absorption, the as-prepared NaYF4:Yb, Er@NaGdF4 core-shell UCNCs exhibited high contrast in in vitro cell imaging and in vivo X-ray computed tomography (CT) imaging, demonstrating great potential as multiplexed luminescent biolabels and CT contrast agents.

  7. Effects of Seed Layer on YBa2Cu3Ox Films Grown by Liquid Phase Epitaxy

    NASA Astrophysics Data System (ADS)

    Zama, Hideaki; Miyakoshi, Masayuki; Yamamoto, Hiroshi; Morishita, Tadataka

    1999-11-01

    Crack-free YBa2Cu3Ox (YBCO) films were grown by liquid phaseepitaxy (LPE) on MgO(100) substrates with a YBCO seed layer. Thecrystalline property of LPE was crucially dependent on that of theseed layer. On the purely c-axis-oriented seed layer, reasonable YBCOfilms were grown with a full-width at half maximum of the (005)reflection rocking curve, Δω, of 0.07°. In the case of the seedincluding an a-axis-oriented grain, the value of Δω of LPE films waspoor in reproducibility and larger than 0.1° on average. For thea-axis-oriented seed, no YBCO films grew under the growth conditionsin this study. X-ray topographic observations revealed that thecrystalline quality of MgO substrates limited the Δω of LPE films grownon them.

  8. Microstructure of GaN epitaxy on SiC using AlN buffer layers

    SciTech Connect

    Ponce, F.A.; Krusor, B.S.; Major, J.S. Jr.; Plano, W.E.; Welch, D.F.

    1995-07-17

    The crystalline structure of GaN epilayers on (0001) SiC substrates has been studied using x-ray diffraction and transmission microscopy. The films were grown by metalorganic chemical vapor deposition, using AlN buffer layers. X-ray diffraction measurements show negligible strain in the epilayer, and a long-range variation in orientation. Transmission electron lattice images show that the AlN buffer layer consists of small crystallites. The nature of the buffer layer and its interfaces with the substrate and the GaN film is discussed. The defect structure of the GaN film away from the substrate consists mostly of threading dislocations with a density of {similar_to}10{sup 9} cm{sup {minus}2}. {copyright} {ital 1995} {ital American} {ital Institute} {ital of} {ital Physics}.

  9. GaAs Solar Cells Grown by Hydride Vapor-Phase Epitaxy and the Development of GaInP Cladding Layers

    SciTech Connect

    Simon, John; Schulte, Kevin L.; Young, David L.; Haegel, Nancy M.; Ptak, Aaron J.

    2016-01-01

    The high cost of high-efficiency III-V photovoltaic devices currently limits them to niche markets. Hydride vapor-phase epitaxy (HVPE) growth of III-V materials recently reemerged as a low-cost, high-throughput alternative to conventional metal- organic vapor-phase epitaxy (MOVPE) growth of high-efficiency solar cells. Previously, we demonstrated unpassivated HVPEgrown GaAs p-n junctions with good quantum efficiency and high open-circuit voltage (Voc). In this work, we demonstrate the growth of GaInPby HVPE for use as a high-quality surface passivation layer to GaAs solar cells. Solar cells grown with GaInP window layers show significantly improved quantum efficiency compared with unpassivated cells, increasing the short-circuit current (JSC) of these low-cost devices. These results show the potential of low-cost HVPE for the growth of high-quality III-V devices.

  10. Anelasticity of GaN Epitaxial Layer in GaN LED

    NASA Astrophysics Data System (ADS)

    Chung, C. C.; Yang, C. T.; Liu, C. Y.

    2016-10-01

    In this work, the anelasticity of the GaN layer in the GaN light-emitting-diode device was studied. The present results show that the forward-voltage of GaN LED increases with time, as the GaN light-emitting-diode was maintained at a constant temperature of 100 °C. We found that the increase of the forward-voltage with time attributes to the delay-response of the piezoelectric fields (internal electrical fields in GaN LED device). And, the delay-response of the internal electrical fields with time is caused by the anelasticity (time-dependent strain) of the GaN layer. Therefore, using the correlation of strain-piezoelectric-forward voltage, a plot of thermal strain of the GaN layer against time can be obtained by measuring the forward-voltage of the studied GaN LED against time. With the curves of the thermal strain of GaN epi-layers versus time, the anelasticity of the GaN compound can be studied. The key anelasticity parameter, characteristic relaxation time, of the GaN is defined to be 2623.76 min in this work.

  11. N/P InP homojunction solar cells with an In0.53Ga0.47As contacting layer grown by liquid phase epitaxy

    NASA Technical Reports Server (NTRS)

    Shen, C. C.; Choi, K. Y.

    1989-01-01

    N/P InP homojunction solar cells with an In sub 0.53 Ga sub 0.47 As contacting layer were fabricated by liquid phase epitaxy (LPE). Electron-Beam-Induced-Current (EBIC) measurements were performed on several selected samples. It was found that the background doping level in the base region sometimes results in a deep junction, which greatly affects the cell performance.

  12. Recombination-current suppression in GaAs p-n junctions grown on AlGaAs buffer layers by molecular-beam epitaxy

    NASA Astrophysics Data System (ADS)

    Rancour, D. P.; Melloch, M. R.; Pierret, R. F.; Lundstrom, M. S.; Klausmeier-Brown, M. E.; Kyono, C. S.

    1987-08-01

    n+pp+GaAs and n+pP+ GaAs/GaAs/Al0.3Ga0.7As mesa diodes have been fabricated from films grown by molecular-beam epitaxy. The diodes made from films employing an AlGaAs buffer layer show marked improvements (a factor of 5 reduction) in recombination current densities. Deep level transient spectroscopy measurements moreover indicate that deep level concentrations are reduced by the AlGaAs buffer.

  13. Nondestructive dislocation delineation using topographically enhanced imaging of surface morphologies in 4H-SiC epitaxial layers

    NASA Astrophysics Data System (ADS)

    Picard, Yoosuf N.; Liu, Kendrick X.; Stahlbush, Robert E.; Twigg, Mark E.; Zhang, Xuan; Skowronski, Marek

    2008-04-01

    The morphology of surface features generated by dislocations present at 4H-SiC epitaxial layer surfaces was investigated by forescattered electron detection (FED) inside a conventional scanning electron microscope. Various growth pit morphologies were correlated to dislocation types using molten KOH etching. Specifically, sharp-apex pits and stripe-shaped pits were consistently linked to screw and edge dislocations, respectively. The size and depth of these growth pits were measured by atomic force microscopy (AFM). Tail-like features were observed by FED emanating from sharp-apex pits and verified by Nomarski optical microscopy (NOM). A mechanism is proposed to explain the FED contrast exhibited by these tail-like features. This mechanism relates the nature of step-flow and spiral growth in the wake of a screw dislocation to the surface distortions resulting in such tail-like features. The Burgers vector direction can thus be determined based on a purely morphological analysis of these tail-like features. The results of this study illustrate the various capabilities of FED for surface imaging as compared to AFM and NOM. The potential for utilizing FED to map dislocation-associated growth pits is discussed.

  14. Brookite TiO2 thin film epitaxially grown on (110) YSZ substrate by atomic layer deposition.

    PubMed

    Kim, Dai-Hong; Kim, Won-Sik; Kim, Sungtae; Hong, Seong-Hyeon

    2014-08-13

    Epitaxial brookite TiO2 (B-TiO2) film was deposited on (110) yttria-stabilized zirconia (YSZ) substrate using plasma-enhanced atomic layer deposition, and its structural, optical, and gas sensing properties were investigated. As-deposited TiO2 film was a pure brookite and (120) oriented. The determined in-plane orientation relationships were [21̅0]B-TiO2//[1̅10]YSZ and [001]B-TiO2 //[001]YSZ. The B-TiO2 film showed ∼70% transmittance and the optical band gap energy was 3.29 eV. The B-TiO2 film-based gas sensor responded to H2 gas even at room temperature and the highest magnitude of the gas response was determined to be ∼150 toward 1000 ppm of H2/air at 150 °C. In addition, B-TiO2 sensor showed a high selectivity for H2 against CO, EtOH, and NH3.

  15. Surface photovoltage and photoluminescence study of thick Ga(In)AsN layers grown by liquid-phase epitaxy

    NASA Astrophysics Data System (ADS)

    Donchev, V.; Milanova, M.; Lemieux, J.; Shtinkov, N.; Ivanov, I. G.

    2016-03-01

    We present an experimental and theoretical study of Ga(In)AsN layers with a thickness of around 1 μm grown by liquid-phase epitaxy (LPE) on n-type GaAs substrates. The samples are studied by surface photovoltage (SPV) spectroscopy and by photoluminescence spectroscopy. Theoretical calculations of the electronic structure and the spectral dependence of the dielectric function are carried out for different nitrogen concentrations using a full-band tight-binding approach in the sp3d5s*sN parameterisation. The SPV spectra measured at room temperature clearly show a red shift of the absorption edge with respect to the absorption of the GaAs substrate. This shift, combined with the results of the theoretical calculations, allows assessing the nitrogen concentration in different samples. The latter increases with increasing the In content. The analysis of the SPV phase spectra provides information about the alignment of the energy bands across the structures. The photoluminescence measurements performed at 2 K show a red shift of the emission energy with respect to GaAs, in agreement with the SPV results.

  16. The effect of neutron irradiation and annealing temperature on the electrical properties and lattice constant of epitaxial gallium nitride layers

    SciTech Connect

    Boyko, V. M.; Verevkin, S. S.; Kolin, N. G. Korulin, A. V.; Merkurisov, D. I.; Polyakov, A. Y.; Chevychelov, V. A.

    2011-01-15

    Effect of irradiation with high reactor-neutron fluences ({Phi} = 1.5 Multiplication-Sign 10{sup 17}-8 Multiplication-Sign 10{sup 19} cm{sup -2}) and subsequent heat treatments in the temperature range 100-1000 Degree-Sign C on the electrical properties and lattice constant of epitaxial GaN layers grown on an Al{sub 2}O{sub 3} substrate is considered. It is shown that, with the neutron fluence increasing to (1-2) Multiplication-Sign 10{sup 18} cm{sup -2}, the resistivity of the material grows to values of about 10{sup 10} {Omega} cm because of the formation of radiation defects, and, with the fluence raised further, the resistivity passes through a maximum and then decreases to 2 Multiplication-Sign 10{sup 6} {Omega} cm at 300 K, which is accounted for by the appearance of a hopping conductivity via deep defects in the overlapping outer parts of disordered regions. With the neutron fluence raised to 8 Multiplication-Sign 10{sup 19} cm{sup -2}, the lattice constant c increases by 0.38% at a nearly unchanged parameter a. Heat treatment of irradiated samples at temperatures as high as 1000 Degree-Sign C does not fully restore the lattice constant and the electrical parameters of the material.

  17. Epitaxial NiO (1 0 0) and NiO (1 1 1) films grown by atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Lindahl, E.; Lu, J.; Ottosson, M.; Carlsson, J.-O.

    2009-08-01

    Epitaxial NiO (1 1 1) and NiO (1 0 0) films have been grown by atomic layer deposition on both MgO (1 0 0) and α-Al 2O 3 (0 0 l) substrates at temperatures as low as 200 °C by using bis(2,2,6,6-tetramethyl-3,5-heptanedionato)Ni(II) and water as precursors. The films grown on the MgO (1 0 0) substrate show the expected cube on cube growth while the NiO (1 1 1) films grow with a twin rotated 180° on the α-Al 2O 3 (0 0 l) substrate surface. The films had columnar microstructures on both substrate types. The single grains were running throughout the whole film thickness and were significantly smaller in the direction parallel to the surface. Thin NiO (1 1 1) films can be grown with high crystal quality with a FWHM of 0.02-0.05° in the rocking curve measurements.

  18. Interfacial reactions in epitaxial Al/TiN(111) model diffusion barriers: Formation of an impervious self-limited wurtzite-structure AIN(0001) blocking layer

    SciTech Connect

    Chun, J.-S.; Desjardins, P.; Lavoie, C.; Shin, C.-S.; Cabral, C.; Petrov, I.; Greene, J. E.

    2001-06-15

    Single-crystal TiN(111) layers, 45 nm thick, were grown on MgO(111) by ultrahigh vacuum reactive magnetron sputter deposition in pure N{sub 2} discharges at T{sub s}=700{degree}C. Epitaxial Al(111) overlayers, 160 nm thick, were then deposited at T{sub s}=100{degree}C in Ar without breaking vacuum. Interfacial reactions and changes in bilayer microstructure due to annealing at 620 and 650{degree}C were investigated using x-ray diffraction and transmission electron microscopy (TEM). The interfacial regions of samples annealed at 620{degree}C consist of continuous {approx_equal}7-nm-thick epitaxial wurtzite-structure AlN(0001) layers containing a high density of stacking faults, with {approx_equal}22 nm thick tetragonal Al{sub 3}Ti(112) overlayers. Surprisingly, samples annealed at the higher temperature are more stable against Al{sub 3}Ti formation. TEM analyses of bilayers annealed at 650{degree}C (10{degree}C below the Al melting point!) reveal only the self-limited growth of an {approx_equal}3-nm-thick interfacial layer of perfect smooth epitaxial wurtzite-structure AlN(0001) which serves as an extremely effective deterrent for preventing further interlayer reactions. {copyright} 2001 American Institute of Physics.

  19. Multilayer epitaxial growth of lead phthalocyanine and C(70) using CuBr as a templating layer for enhancing the efficiency of organic photovoltaic cells.

    PubMed

    Kim, Tae-Min; Shim, Hyun-Sub; Choi, Min-Soo; Kim, Hyo Jung; Kim, Jang-Joo

    2014-03-26

    The molecular orientation and crystallinity of donor and acceptor molecules are important for high-efficiency organic photovoltaic cells (OPVs) because they significantly influence both the absorption of light and charge-transport characteristics. We report that the templating effect extends to multilayers to increase the crystallinity and to modify the orientation of the crystals of lead phthalocyanine (PbPc) and C70 layers at the same time by adopting CuBr as a new templating layer on indium tin oxide (ITO). The formation of a monoclinic phase with a preferred orientation of (320) for PbPc and a fcc phase with a preferred orientation of (220) for C70 on the PbPc layer is revealed by X-ray diffraction (XRD) patterns. The multilayer epitaxy results in an increase of the exciton diffusion lengths from 5.6 to 8.8 nm for PbPc and from 6.9 to 13.8 nm for C70 to enhance the power conversion efficiency (PCE) of the planar heterojunction OPVs composed of PbPc and C70 from 1.4 to 2.3%. The quasi-epitaxy model is proposed to explain the multilayer epitaxy.

  20. Growth of ultrahigh-Sn-content Ge1- x Sn x epitaxial layer and its impact on controlling Schottky barrier height of metal/Ge contact

    NASA Astrophysics Data System (ADS)

    Suzuki, Akihiro; Nakatsuka, Osamu; Shibayama, Shigehisa; Sakashita, Mitsuo; Takeuchi, Wakana; Kurosawa, Masashi; Zaima, Shigeaki

    2016-04-01

    We examined the epitaxial growth of an ultrahigh-Sn-content Ge1- x Sn x layer on a Ge substrate and investigated the impact of a Ge1- x Sn x interlayer on the Schottky barrier height (SBH) of the metal/Ge contact. In this study, we considered guidelines of the strain energy and growth temperature to realize a high-Sn-content Ge1- x Sn x layer while keeping the epitaxial growth and suppressing the Sn precipitation. By reducing the film thickness and keeping a low growth temperature, we formed an atomically flat and uniform Ge1- x Sn x epitaxial layer with a Sn content up to 46% on a Ge(001) substrate. We also performed the current density-voltage measurement for Al/Ge1- x Sn x /n-Ge Schottky diodes to estimate the SBH. We found that the SBH of Al/Ge1- x Sn x /n-Ge contact decreases with increasing Sn content in the Ge1- x Sn x interlayer. The shift of the pinning position towards the conduction band edge of Ge is one of the reasons for the SBH reduction of Al/Ge1- x Sn x /n-Ge contact because the valence band edge of Ge1- x Sn x would rise as the Sn content increases.

  1. Quantitative C lattice site distributions in epitaxial Ge{sub 1-y}C{sub y}/Ge(001) layers

    SciTech Connect

    D'Arcy-Gall, J.; Gall, D.; Petrov, I.; Desjardins, P.; Greene, J. E.

    2001-10-15

    Epitaxial metastable Ge{sub 1-y}C{sub y} alloy layers with y{<=}0.035 were grown on Ge(001) from hyperthermal Ge and C atomic beams at deposition temperatures T{sub s} of 250 and 300 C. The use of hyperthermal beams allows us to controllably vary the concentration of C incorporated as Ge--C split interstitials. Ge{sub 1-y}C{sub y} layers grown with incident Ge-atom energy distributions corresponding to {<=}0.14 lattice displacement per incident atom (dpa) are in a state of in-plane tension and contain significant concentrations of C atoms incorporated in substitutional sites. Increasing the dpa to 0.24 yields layers in compression with C incorporated primarily as Ge--C split interstitials. Ab initio density functional calculations of the formation energies and strain coefficients associated with C atomic arrangements in Ge show that configurations containing multiple C atoms, referred to collectively as C nanoclusters, are energetically more favorable than substitutional C and Ge--C split interstitials and yield a nearly zero average strain. In contrast, substitutional C and Ge--C split interstitials produce large tensile and compressive strains, respectively. Using the calculated strain coefficients, measured layer strains obtained from high-resolution reciprocal lattice maps, and substitutional C concentrations determined by Raman spectroscopy, we obtain the fraction of C atoms incorporated in substitutional, Ge--C split interstitial, and nanocluster sites as a function of the total C concentration y and T{sub s}. We find that at low y and T{sub s} values, all C atoms are incorporated in single-C configurations: substitutional C and Ge--C split interstitials. Their relative concentrations are controlled by the dpa through the production of near-surface Ge self-interstitials which are trapped by substitutional C atoms to form Ge--C split interstitials. Increasing y and T{sub s}, irrespective of the dpa, leads to an increase in the fraction of C nanoclusters, while

  2. Epitaxial Gd2O3 on strained Si1-xGex layers for next generation complementary metal oxide semiconductor device application

    NASA Astrophysics Data System (ADS)

    Ghosh, Kankat; Das, Sudipta; Fissel, A.; Osten, H. J.; Laha, Apurba

    2013-10-01

    Strained Si1-xGex (x = 0.1-0.4) layers were grown on Si(111) and Si(001) substrates using molecular beam epitaxy followed by the growth of epitaxial Gd2O3 thin films on Si1-xGex layers using same technique. Pt/Gd2O3/Si1-xGex/Si stacks fabricated by several in situ process steps exhibit excellent electrical properties. Surface and microstructural analysis of both Si1-xGex and Gd2O3 layers carried out by different in situ and ex situ tools reveal a relaxed epi-Gd2O3 layer on a strained Si1-xGex layer on both Si(111) and Si(001) substrates with sharp interfaces between the oxide and the SiGe layer. Standard electrical measurements, such as capacitance-voltage and leakage current analysis, demonstrate promising electrical properties for such metal oxide semiconductor capacitors. A capacitance equivalent thickness as low as 1.20 nm with associated leakage current density of 2.0 mA/cm2 was obtained for devices with 4.5 nm thin oxide films where the density of interface trap (Dit) was only ˜1011 cm-2 eV-1.

  3. Impact of LT-GaAs layers on crystalline properties of the epitaxial GaAs films grown by MBE on Si substrates

    NASA Astrophysics Data System (ADS)

    Petrushkov, M. O.; Putyato, M. A.; Gutakovsky, A. K.; Preobrazhenskii, V. V.; Loshkarev, I. D.; Emelyanov, E. A.; Semyagin, B. R.; Vasev, A. V.

    2016-08-01

    GaAs films with low-temperature GaAs (LT-GaAs) layers were grown by molecular beam epitaxy (MBE) method on vicinal (001) Si substrates oriented 6° off towards [110]. The grown structures were different with the thickness of LT-GaAs layers and its arrangement in the film. The processes of epitaxial layers nucleation and growth were controlled by reflection high energy electron diffraction (RHEED) method. Investigations of crystalline properties of the grown structures were carried out by the methods of X-ray diffraction (XRD) and transmission electron microscopy (TEM). The crystalline perfection of the GaAs films with LT-GaAs layers and the GaAs films without ones was comparable. It was found that in the LT- GaAs/Si layers the arsenic clusters are formed, as it occurs in the LT-GaAs/GaAs system without dislocation. It is shown that large clusters are formed mainly on the dislocations. However, the clusters have practically no effect on the density and the propagation path of threading dislocations. With increasing thickness of LT-GaAs layer the dislocations are partly bent along the LT-GaAs/GaAs interface due to the presence of stresses.

  4. Nucleation, Growth, and Strain Relaxation of Lattice-Mismatched III-V Semiconductor Epitaxial Layers

    NASA Technical Reports Server (NTRS)

    Welser, R. E.; Guido, L. J.

    1994-01-01

    We have investigated the early stages of evolution of highly strained 2-D InAs layers and 3-D InAs islands grown by metal-organic chemical vapor deposition (MOCVD) on (100) and (111) B GaAs substrates. The InAs epilayer / GaAs substrate combination has been chosen because the lattice-mismatch is severe (approx. 7.20%), yet these materials are otherwise very similar. By examining InAs-on-GaAs composites Instead of the more common In(x)Ga(1-x)As alloy, we remove an additional degree of freedom (x) and thereby simplify data interpretation. A matrix of experiments is described in which the MOCVD growth parameters -- susceptor temperature, TMIn flux, and AsH3 flux -- have been varied over a wide range. Scanning electron microscopy, atomic force microscopy, transmission electron microscopy, and electron microprobe analysis have been employed to observe the thin film surface morphology. In the case of 3-D growth, we have extracted activation energies and power-dependent exponents that characterize the nucleation process. As a consequence, optimized growth conditions have been identified for depositing approx. 250 A thick (100) and (111)B oriented InAs layers with relatively smooth surfaces. Together with preliminary data on the strain relaxation of these layers, the above results on the evolution of thin InAs films indicate that the (111)B orientation is particularly promising for yielding lattice-mismatched films that are fully relaxed with only misfit dislocations at the epilayer / substrate interface.

  5. Nucleation, growth, and strain relaxation of lattice-mismatched 3-5 semiconductor epitaxial layers

    NASA Technical Reports Server (NTRS)

    Welser, R. E.; Guido, L. J.

    1994-01-01

    We have investigated the early stages of evolution of highly strained 2-D InAs layers and 3-D InAs islands grown by metal-organic chemical vapor deposition (MOCVD) on (100) and (111)B GaAs substrates. The InAs epilayer/GaAs substrate combination has been chosen because the lattice-mismatch is severe (approximately 7.2 percent), yet these materials are otherwise very similar. By examining InAs-on-GaAs composites instead of the more common In(x)Ga(1-x)As alloy we remove an additional degree of freedom (x) and thereby simplify data interpretation. A matrix of experiments is described in which the MOCVD growth parameters - susceptor temperature, Thin flux, and AsH3 flux - have been varied over a wide range. Scanning electron microscopy, atomic force microscopy, transmission electron microscopy, and electron microprobe analysis have been employed to observe the thin film surface morphology. In the case of 3-D growth, we have extracted activation energies and power-dependent exponents that characterize the nucleation process. As a consequence, optimized growth conditions have been identified for depositing approximately 250 A thick (100) and (111)B oriented InAs layers with relatively smooth surfaces. Together with preliminary data on the strain relaxation of these layers, the above results on the evolution of thin InAs films indicate that the (111)B orientation is particularly promising for yielding lattice-mismatched films that are fully relaxed with only misfit dislocations at the epilayer/substrate interface.

  6. Far-infrared magnetospectroscopy on epitaxial zero-gap and wide-gap semiconductor layer systems

    NASA Astrophysics Data System (ADS)

    Kempf, P.; von Ortenberg, M.; Bicknell-Tassius, R.; Waag, A.

    1992-02-01

    Far-infrared magnetotransmission measurements have been performed on MBE-grown HgTe and CdTe epilayers. The results on the HgTe samples can be understood by the standard Pidgeon-Brown model for bulk HgTe. For the CdTe layers, transitions were only observed under illumination by visible light. The spectra are dominated by the 1 s→2 p transition of the shallow hydrogen-like impurity. These transitions are persistent with a life time of the order of magnitude of one second.

  7. Atomically layer-by-layer diffusion of oxygen/hydrogen in highly epitaxial PrBaCo{sub 2}O{sub 5.5+δ} thin films

    SciTech Connect

    Bao, Shanyong; Xu, Xing; Enriquez, Erik; Mace, Brennan E.; Chen, Garry; Kelliher, Sean P.; Chen, Chonglin; Zhang, Yamei; Whangbo, Myung-Hwan; Dong, Chuang; Zhang, Qinyu

    2015-12-14

    Single-crystalline epitaxial thin films of PrBaCo{sub 2}O{sub 5.5+δ} (PrBCO) were prepared, and their resistance R(t) under a switching flow of oxidizing and reducing gases were measured as a function of the gas flow time t in the temperature range of 200–800 °C. During the oxidation cycle under O{sub 2}, the PrBCO films exhibit fast oscillations in their dR(t)/dt vs. t plots, which reflect the oxidation processes, Co{sup 2+}/Co{sup 3+} → Co{sup 3+} and Co{sup 3+} → Co{sup 3+}/Co{sup 4+}, that the Co atoms of PrBCO undergo. Each oscillation consists of two peaks, with larger and smaller peaks representing the oxygen/hydrogen diffusion through the (BaO)(CoO{sub 2})(PrO)(CoO{sub 2}) layers of PrBCO via the oxygen-vacancy-exchange mechanism. This finding paves a significant avenue for cathode materials operating in low-temperature solid-oxide-fuel-cell devices and for chemical sensors with wide range of operating temperature.

  8. Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition.

    PubMed

    Lin, Edward L; Edmondson, Bryce I; Hu, Shen; Ekerdt, John G

    2016-01-01

    Atomic layer deposition (ALD) is a commercially utilized deposition method for electronic materials. ALD growth of thin films offers thickness control and conformality by taking advantage of self-limiting reactions between vapor-phase precursors and the growing film. Perovskite oxides present potential for next-generation electronic materials, but to-date have mostly been deposited by physical methods. This work outlines a method for depositing SrTiO3 (STO) on germanium using ALD. Germanium has higher carrier mobilities than silicon and therefore offers an alternative semiconductor material with faster device operation. This method takes advantage of the instability of germanium's native oxide by using thermal deoxidation to clean and reconstruct the Ge (001) surface to the 2×1 structure. 2-nm thick, amorphous STO is then deposited by ALD. The STO film is annealed under ultra-high vacuum and crystallizes on the reconstructed Ge surface. Reflection high-energy electron diffraction (RHEED) is used during this annealing step to monitor the STO crystallization. The thin, crystalline layer of STO acts as a template for subsequent growth of STO that is crystalline as-grown, as confirmed by RHEED. In situ X-ray photoelectron spectroscopy is used to verify film stoichiometry before and after the annealing step, as well as after subsequent STO growth. This procedure provides framework for additional perovskite oxides to be deposited on semiconductors via chemical methods in addition to the integration of more sophisticated heterostructures already achievable by physical methods. PMID:27501462

  9. Direct-Write Molecular Layer Epitaxy by Thermal Dip-Pen Nanolithography

    NASA Astrophysics Data System (ADS)

    Yang, M.; King, W. P.; Whitman, L. J.

    2005-03-01

    Achieving nanometer-scale control of structure in organic thin films is crucial to understand charge transport and thereby develop reliable devices such as organic FETs and LEDs. Although a variety of methods can be used to reliably deposit thin polymer films, fabrication of polymer nanostructures remains a significant challenge. We have developed a new technique, thermal dip-pen nanolithography (tDPN),^1 that can be used to directly write such nanostructures. In tDPN a custom AFM cantilever with an integral tip heater is pre-coated with a solid ``ink,'' which can then be precisely deposited onto a substrate by heating the tip above the ink’s melting temperature. Using this technique, poly(3-dodecylthiophene) nanostructures have been deposited on silicon oxide surfaces with layer-by-layer thickness control. By adjusting the tip heating power and the writing speed, we can vary the polymer thickness from a single monolayer (about 2.8 nm) to tens of monolayers with lateral dimensions <200 nm. ^1P. A. Sheehan, et al., Appl. Phys. Lett. 85, 1589 (2004).

  10. Epitaxial growth of ZnO film on Si(1 1 1) with CeO2(1 1 1) as buffer layer

    NASA Astrophysics Data System (ADS)

    Wong, T. I.; Tan, H. R.; Sentosa, D.; Wong, L. M.; Wang, S. J.; Feng, Y. P.

    2012-10-01

    ZnO(0 0 2) epitaxial films have been successfully grown on Si(1 1 1) with CeO2 as a buffer layer by pulsed laser deposition. In spite of large lattice mismatch between ZnO and CeO2, good film quality was achieved, as proven by Fourier filtered high-resolution transmission electron microscopy (HRTEM) image, due to reduction in interface strain by domain matching epitaxy. The epitaxial relationship of ZnO and CeO2 on the Si substrate was determined to be (0 0 2)[2 1 0]ZnO‖(1 1 1)[1 1 2] _CeO_2\\Vert (1 1 1)[1 1 2]Si. The HRTEM images show low defect concentrations in both the deposited ZnO film and CeO2 layer. Ordered crack lines are observed on the surface of the ZnO film which are due to A-type and B-type stackings of CeO2 on Si(1 1 1). Sharp near-band edge emission at 3.253 eV was detected for the ZnO film through photoluminiscence measurement at room temperature.

  11. High-barrier Schottky contact on n-type 4H-SiC epitaxial layer and studies of defect levels by deep level transient spectroscopy (DLTS)

    NASA Astrophysics Data System (ADS)

    Nguyen, Khai V.; Pak, Rahmi O.; Oner, Cihan; Mannan, Mohammad A.; Mandal, Krishna C.

    2015-08-01

    High barrier Schottky contact has been fabricated on 50 μm n-type 4H-SiC epitaxial layers grown on 350 μm thick substrate 8° off-cut towards the [11̅20] direction. The 4H-SiC epitaxial wafer was diced into 10 x 10 mm2 samples. The metal-semiconductor junctions were fabricated by photolithography and dc sputtering with ruthenium (Ru). The junction properties were characterized through current-voltage (I-V) and capacitance-voltage (C-V) measurements. Detectors were characterized by alpha spectroscopy measurements in terms of energy resolution and charge collection efficiency using a 0.1 μCi 241Am radiation source. It was found that detectors fabricated from high work function rare transition metal Ru demonstrated very low leakage current and significant improvement of detector performance. Defect characterization of the epitaxial layers was conducted by deep level transient spectroscopy (DLTS) to thoroughly investigate the defect levels in the active region. The presence of a new defect level induced by this rare transition metal-semiconductor interface has been identified and characterized.

  12. Growth of high-quality InN thin films on InGaN buffer layer by plasma-assisted molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Yang, Chen-Chi; Lo, Ikai; Shih, Cheng-Hung; Hu, Chia-Hsuan; Wang, Ying-Chieh; Lin, Yu-Chiao; Tasi, Cheng-Da; You, Shuo-Ting

    2015-03-01

    Four samples were grown on 2 inch c-plane (0001) sapphire substrates with 4 μm-thick GaN template. The InN thin films were grown on InGaN buffer layer by low-temperature plasma-assisted molecular beam epitaxy (PAMBE) system. These samples were grown under a varied temperature of InGaN buffer layers: 500°C, 540°C, 570°C, and 600°C. The structure properties of these samples were analyzed by X-ray diffraction (XRD). The interference fringes of InN grown on the sample 1 (the growth temperature of InGaN buffer layer at 500°C) exhibit prominent oscillations, which indicates that the sample has a high quality and layer by layer epitaxial structure. The surface morphology and microstructure of samples were investigated by scanning electron microscopy (SEM), atomic force microscopy (AFM), and transmission electron microscopy (TEM). We confirmed the smooth surface and high quality crystalline for the sample.

  13. Control of metamorphic buffer structure and device performance of In(x)Ga(1-x)As epitaxial layers fabricated by metal organic chemical vapor deposition.

    PubMed

    Nguyen, H Q; Yu, H W; Luc, Q H; Tang, Y Z; Phan, V T H; Hsu, C H; Chang, E Y; Tseng, Y C

    2014-12-01

    Using a step-graded (SG) buffer structure via metal-organic chemical vapor deposition, we demonstrate a high suitability of In0.5Ga0.5As epitaxial layers on a GaAs substrate for electronic device application. Taking advantage of the technique's precise control, we were able to increase the number of SG layers to achieve a fairly low dislocation density (∼10(6) cm(-2)), while keeping each individual SG layer slightly exceeding the critical thickness (∼80 nm) for strain relaxation. This met the demanded but contradictory requirements, and even offered excellent scalability by lowering the whole buffer structure down to 2.3 μm. This scalability overwhelmingly excels the forefront studies. The effects of the SG misfit strain on the crystal quality and surface morphology of In0.5Ga0.5As epitaxial layers were carefully investigated, and were correlated to threading dislocation (TD) blocking mechanisms. From microstructural analyses, TDs can be blocked effectively through self-annihilation reactions, or hindered randomly by misfit dislocation mechanisms. Growth conditions for avoiding phase separation were also explored and identified. The buffer-improved, high-quality In0.5Ga0.5As epitaxial layers enabled a high-performance, metal-oxide-semiconductor capacitor on a GaAs substrate. The devices displayed remarkable capacitance-voltage responses with small frequency dispersion. A promising interface trap density of 3 × 10(12) eV(-1) cm(-2) in a conductance test was also obtained. These electrical performances are competitive to those using lattice-coherent but pricey InGaAs/InP systems.

  14. Investigation of ZnO thin films deposited on ferromagnetic metallic buffer layer by molecular beam epitaxy toward realization of ZnO-based magnetic tunneling junctions

    SciTech Connect

    Belmoubarik, M.; Nozaki, T.; Sahashi, M.; Endo, H.

    2013-05-07

    Deposition of ZnO thin films on a ferromagnetic metallic buffer layer (Co{sub 3}Pt) by molecular beam epitaxy technique was investigated for realization of ZnO-based magnetic tunneling junctions with good quality hexagonal ZnO films as tunnel barriers. For substrate temperature of 600 Degree-Sign C, ZnO films exhibited low oxygen defects and high electrical resistivity of 130 {Omega} cm. This value exceeded that of hexagonal ZnO films grown by sputtering technique, which are used as tunnel barriers in ZnO-MTJs. Also, the effect of oxygen flow during deposition on epitaxial growth conditions and Co{sub 3}Pt surface oxidation was discussed.

  15. Scanning proximal microscopy study of the thin layers of silicon carbide-aluminum nitride solid solution manufactured by fast sublimation epitaxy

    NASA Astrophysics Data System (ADS)

    Dallaeva, D.; Korostylev, E.; Bilalov, B.; Tománek, P.

    2013-04-01

    The objective of the study is a growth of SiC/(SiC)1-x(AlN)x structures by fast sublimation epitaxy of the polycrystalline source of (SiC)1-x(AlN)x and their characterisation by proximal scanning electron microscopy and atomic force microscopy. For that purpose optimal conditions of sublimation process have been defined. Manufactured structures could be used as substrates for wide-band-gap semiconductor devices on the basis of nitrides, including gallium nitride, aluminum nitride and their alloys, as well as for the production of transistors with high mobility of electrons and also for creation of blue and ultraviolet light emitters (light-emitted diodes and laser diodes). The result of analysis shows that increasing of the growth temperature up to 2300 K allows carry out sublimation epitaxy of thin layers of aluminum nitride and its solid solution.

  16. Structural Anisotropy and Optical Properties of Nonpolar a-Plane GaN Epitaxial Layers.

    PubMed

    Seo, Yong Gon; Shin, Sun Hye; Kim, Doo Soo; Yoon, Hyung-Do; Hwang, Sung-Min; Baik, Kwang Hyeon

    2015-10-01

    In-plane structural anisotropy is characteristic of nonpolar (1120) a-plane GaN (a-GaN) films grown on r-plane sapphire substrates. The anisotropic peak broadenings of X-ray rocking curves (XRCs) are clearly observed with M- or W-shaped dependence on the azimuth angles. We investigated the optical properties of both M- and W-shaped a-GaN samples with room and low-temperature photoluminescence (PL) measurements. The W-shaped a-GaN film showed higher PL intensity and more compressive strain compared to the M-shaped a-GaN film, whereas the XRC peak widths of the M-shaped a-GaN film on the azimuth angles are lower than those of W-shaped specimens, indicating that better crystalline quality was obtained. We speculate that the PL intensity and strain state of a-GaN layers may be more influenced by the crystallinity of a specific crystal orientation or direction, especially along the m-axis as opposed to the c-axis. This occurrence is most likely due to anisotropic defect distributions, resulting from differences in dangling bond densities of (0001) and {1-100} facets.

  17. New PLAD apparatus and fabrication of epitaxial films and junctions of functional materials: SiC, GaN, ZnO, diamond and GMR layers

    NASA Astrophysics Data System (ADS)

    Muto, Hachizo; Kusumori, Takeshi; Nakamura, Toshiyuki; Asano, Takashi; Hori, Takahiro

    2006-04-01

    We have developed a new pulsed laser ablation-deposition (PLAD) apparatus and techniques for fabricating films of high-temperature or functional materials, including two short-wavelength lasers: (a) a YAG 5th harmonic (213 nm) and (b) Raman-shifted lasers containing vacuum ultraviolet light; also involved are (c) a high-temperature heater with a maximum temperature of 1350 °C, (d) dual-target simultaneous ablation mechanics, and (e) hybrid PLAD using a pico-second YAG laser combined with (c) and/or (d). Using the high-T heater, hetero-epitaxial films of 3C-, 2H- and 4H-SiC have been prepared on sapphire-c. In situ p-doping for GaN epitaxial films is achieved by simultaneous ablation of GaN and Mg targets by (d) during film growth. Junctions such as pGaN (Mg-doped)-film/n-SiC(0 0 0 1) substrate and pGaN/n-Si(1 1 1) show good diode characteristics. Epitaxial films with a diamond lattice can be grown on the sapphire-c plane by hybrid PLAD (e) with a high-T heater using a 6H-SiC target. High quality epitaxial films of ZnO are grown by PLAD by introducing a low-temperature self-buffer layer; magnetization of ferromagnetic materials is enforced by overlaying on a ferromagnetic lattice plane of an anti-ferromagnetic material, showing the value of the layer-overlaying method in improving quality. The short-wavelength lasers are useful in reducing surface particles on functional films, including superconductors.

  18. Carbon Doping of Compound Semiconductor Epitaxial Layers Grown by Metalorganic Chemical Vapor Deposition Using Carbon Tetrachloride.

    NASA Astrophysics Data System (ADS)

    Cunningham, Brian Thomas

    1990-01-01

    A dilute mixture of CCl_4 in high purity H_2 has been used as a carbon dopant source for rm Al_ {x}Ga_{1-x}As grown by low pressure metalorganic chemical vapor deposition (MOCVD). To understand the mechanism for carbon incorporation from CCl_4 doping and to provide experimental parameters for the growth of carbon doped device structures, the effects of various crystal growth parameters on CCl _4 doping have been studied, including growth temperature, growth rate, V/III ratio, Al composition, and CCl_4 flow rate. Although CCl _4 is an effective p-type dopant for MOCVD rm Al_{x}Ga_ {1-x}As, injection of CCl_4 into the reactor during growth of InP resulted in no change in the carrier concentration or carbon concentration. Abrupt, heavy carbon doping spikes in GaAs have been obtained using CCl_4 without a dopant memory effect. By annealing samples with carbon doping spikes grown within undoped, n-type, and p-type GaAs, the carbon diffusion coefficient in GaAs at 825 ^circC has been estimated and has been found to depend strongly on the GaAs background doping. Heavily carbon doped rm Al_{x}Ga _{1-x}As/GaAs superlattices have been found to be more stable against impurity induced layer disordering (IILD) than Mg or Zn doped superlattices, indicating that the low carbon diffusion coefficient limits the IILD process. Carbon doping has been used in the base region on an Npn AlGaAs/GaAs heterojunction bipolar transistor (HBT). Transistors with 3 x 10 μm self-aligned emitter fingers have been fabricated which exhibit a current gain cutoff frequency of f_ {rm t} = 26 GHz.

  19. Epitaxial solar cells fabrication

    NASA Technical Reports Server (NTRS)

    Daiello, R. V.; Robinson, P. H.; Kressel, H.

    1975-01-01

    Silicon epitaxy has been studied for the fabrication of solar cell structures, with the intent of optimizing efficiency while maintaining suitability for space applications. SiH2CL2 yielded good quality layers and junctions with reproducible impurity profiles. Diode characteristics and lifetimes in the epitaxial layers were investigated as a function of epitaxial growth conditions and doping profile, as was the effect of substrates and epitaxial post-gettering on lifetime. The pyrolytic decomposition of SiH4 was also used in the epitaxial formation of highly doped junction layers on bulk Si wafers. The effects of junction layer thickness and bulk background doping level on cell performance, in particular, open-circuit voltage, were investigated. The most successful solar cells were fabricated with SiH2 CL2 to grow p/n layers on n(+) substrates. The best performance was obtained from a p(+)/p/n/n(+) structure grown with an exponential grade in the n-base layer.

  20. Growth of a delta-doped silicon layer by molecular beam epitaxy on a charge-coupled device for reflection-limited ultraviolet quantum efficiency

    NASA Technical Reports Server (NTRS)

    Hoenk, Michael E.; Grunthaner, Paula J.; Grunthaner, Frank J.; Terhune, R. W.; Fattahi, Masoud; Tseng, Hsin-Fu

    1992-01-01

    Low-temperature silicon molecular beam epitaxy is used to grow a delta-doped silicon layer on a fully processed charge-coupled device (CCD). The measured quantum efficiency of the delta-doped backside-thinned CCD is in agreement with the reflection limit for light incident on the back surface in the spectral range of 260-600 nm. The 2.5 nm silicon layer, grown at 450 C, contained a boron delta-layer with surface density of about 2 x 10 exp 14/sq cm. Passivation of the surface was done by steam oxidation of a nominally undoped 1.5 nm Si cap layer. The UV quantum efficiency was found to be uniform and stable with respect to thermal cycling and illumination conditions.

  1. Impact of growth and annealing conditions on the parameters of Ge/Si(001) relaxed layers grown by molecular beam epitaxy

    SciTech Connect

    Yurasov, D. V.; Bobrov, A. I.; Daniltsev, V. M.; Novikov, A. V.; Pavlov, D. A.; Skorokhodov, E. V.; Shaleev, M. V.; Yunin, P. A.

    2015-11-15

    Influence of the Ge layer thickness and annealing conditions on the parameters of relaxed Ge/Si(001) layers grown by molecular beam epitaxy via two-stage growth is investigated. The dependences of the threading dislocation density and surface roughness on the Ge layer thickness, annealing temperature and time, and the presence of a hydrogen atmosphere are obtained. As a result of optimization of the growth and annealing conditions, relaxed Ge/Si(001) layers which are thinner than 1 μm with a low threading dislocation density on the order of 10{sup 7} cm{sup –2} and a root mean square roughness of less than 1 nm are obtained.

  2. Effect of L1{sub 2} ordering in antiferromagnetic Ir-Mn epitaxial layer on exchange bias of FePd films

    SciTech Connect

    Chang, Y. C.; Duh, J. G. E-mail: lin.yg@nsrrc.org.tw; Hsiao, S. N. E-mail: lin.yg@nsrrc.org.tw; Liu, S. H.; Su, S. H.; Chiu, K. F.; Hsieh, W. C.; Chen, S. K.; Lin, Y. G. E-mail: lin.yg@nsrrc.org.tw; Lee, H. Y.; Sung, C. K.

    2015-05-07

    Two series of samples of single-layer IrMn and IrMn/FePd bilayer films, deposited on a single-crystal MgO substrate at different IrMn deposition temperatures (T{sub s} = 300–700 °C), were investigated using magnetron sputtering. L1{sub 2} ordering was revealed for the 30 nm-thick IrMn epitaxial (001) films with T{sub s} ≥ 400 °C, determined by synchrotron radiation x-ray diffractometry (XRD). XRD results also provide evidence of the epitaxial growth of the IrMn films on MgO substrate. Increasing T{sub s} from 400 to 700 °C monotonically increases the ordering parameter of L1{sub 2} phases from 0.17 to 0.81. An in-plane exchange bias field (H{sub eb}) of 22 Oe is obtained in a 10 nm-thick FePd film that is deposited on the disordered IrMn films. As the L1{sub 2} ordering of the IrMn layers increases, the H{sub eb} gradually decreases to 0 Oe, meaning that the exchange bias behavior vanishes. The increased surface roughness, revealed by atomic force microscopy, of the epitaxial IrMn layers with increasing T{sub s} cannot be the main cause of the decrease in H{sub eb} due to the compensated surface spins regardless of the disordered and ordered (001) IrMn layers. The change of antiferromagnetic structure from the A1 to the L1{sub 2} phase was correlated with the evolution of H{sub eb}.

  3. Formation and stability of crystalline and amorphous Al2O3 layers deposited on Ga2O3 nanowires by atomic layer epitaxy

    NASA Astrophysics Data System (ADS)

    Katz, M. B.; Twigg, M. E.; Prokes, S. M.

    2016-09-01

    Although the crystalline α and γ phases are the most stable forms of alumina, small-diameter (<6 nm) nanoparticles are known to be completely amorphous, due to the surface energy being correspondingly lower for the less stable non-crystalline phase. Al2O3 films with a thickness of 5 nm grown by low temperature (200 °C) atomic layer deposition (ALD) on small-diameter (<20 nm) Ga2O3 nanowires (NWs), however, are identified by transmission electron microscopy as belonging to the α, γ, and possibly θ crystalline phases of Al2O3, while films deposited on larger diameter (>20 nm) NWs are found to be amorphous. Indeed, until recently, all Al2O3, films deposited by low-temperature ALD using trimethylaluminum and water have been reported to be amorphous, regardless of film thickness or substrate. The formation of a crystalline ALD film can be understood in terms of the energetics of misfit dislocations that maintain the registry between the ALD film and the NW substrate, as well as the influence of strain and surface energy. The decreasing energy of co-axial misfit dislocations with NW diameter results in a corresponding decrease in the contribution of the Al2O3/Ga2O3 interface to the free energy, while the interfacial energy for an amorphous film is independent of the NW diameter. Therefore, for NW cores of sufficiently small diameter, the free energy contribution of the Al2O3/Ga2O3 interface is smaller for crystalline films than for amorphous films, thereby favoring the formation of crystalline films for small-diameter NWs. For ALD Al2O3 films of 10 nm thickness deposited on small-diameter Ga2O3 NWs, however, only the first 5 nm of the ALD film is found to be crystalline, possibly due to well-established kinetic limitations to low temperature epitaxial growth.

  4. A silicon-based photocathode for water reduction with an epitaxial SrTiO3 protection layer and a nanostructured catalyst

    NASA Astrophysics Data System (ADS)

    Ji, Li; McDaniel, Martin D.; Wang, Shijun; Posadas, Agham B.; Li, Xiaohan; Huang, Haiyu; Lee, Jack C.; Demkov, Alexander A.; Bard, Allen J.; Ekerdt, John G.; Yu, Edward T.

    2015-01-01

    The rapidly increasing global demand for energy combined with the environmental impact of fossil fuels has spurred the search for alternative sources of clean energy. One promising approach is to convert solar energy into hydrogen fuel using photoelectrochemical cells. However, the semiconducting photoelectrodes used in these cells typically have low efficiencies and/or stabilities. Here we show that a silicon-based photocathode with a capping epitaxial oxide layer can provide efficient and stable hydrogen production from water. In particular, a thin epitaxial layer of strontium titanate (SrTiO3) was grown directly on Si(001) by molecular beam epitaxy. Photogenerated electrons can be transported easily through this layer because of the conduction-band alignment and lattice match between single-crystalline SrTiO3 and silicon. The approach was used to create a metal-insulator-semiconductor photocathode that, under a broad-spectrum illumination at 100 mW cm-2, exhibits a maximum photocurrent density of 35 mA cm-2 and an open circuit potential of 450 mV there was no observable decrease in performance after 35 hours of operation in 0.5 M H2SO4. The performance of the photocathode was also found to be highly dependent on the size and spacing of the structured metal catalyst. Therefore, mesh-like Ti/Pt nanostructured catalysts were created using a nanosphere lithography lift-off process and an applied-bias photon-to-current efficiency of 4.9% was achieved.

  5. Debonding behavior between [beta]-Si[sub 3]N[sub 4] whiskers and oxynitride glasses with or without an epitaxial [beta]-SiAlON interfacial layer

    SciTech Connect

    Sun, E.Y.; Becher, P.F.; Hsueh, C.H.; Painter, G.S.; Waters, S.B.; Hwang, S.L. . Metals and Ceramics Div.); Hoffmann, M.J. . Inst. of Ceramics in Mechanical Engineering)

    1999-07-09

    In order to gain insight on the influence of intergranular glass on the fracture toughness of silicon nitride, the debonding behavior of the interface between the prismatic faces of [beta]-Si[sub 3]N[sub 4] whiskers and oxynitride glasses was investigated in model systems based on various Si-(Al)-Y(Ln)-O-N (Ln: rare-earth) oxynitride glasses. It was found that while the interfacial debonding strength increased when an epitaxial [beta][prime]-SiAlON layer grew on the [beta]-Si[sub 3]N[sub 4] whiskers, the critical angle for debonding was lowered with increasing Al and O concentrations in the SiAlON layer. Only in the absence of a SiAlON epitaxial layer, were debonding conditions altered by residual stresses imposed on the interface due to thermal-mechanical mismatch. A possible explanation for the effect of SiAlON formation and its composition on the debonding behavior is suggested by first-principles atomic cluster calculations. It is concluded that by tailoring the densification additives and hence the chemistry of the intergranular glass, it is possible to improve the fracture resistance of silicon nitride.

  6. Nitridation- and Buffer-Layer-Free Growth of [1100]-Oriented GaN Domains on m-Plane Sapphire Substrates by Using Hydride Vapor Phase Epitaxy

    NASA Astrophysics Data System (ADS)

    Seo, Yeonwoo; Lee, Sanghwa; Jue, Miyeon; Yoon, Hansub; Kim, Chinkyo

    2012-12-01

    Over a wide range of growth conditions, GaN domains were grown on bare m-plane sapphire substrates by using hydride vapor phase epitaxy (HVPE), and the relation between these growth conditions and three possible preferred crystallographic orientations ([1100], [1103], [1122]) of GaN domains was investigated. In contrast with the previous reports by other groups, our results revealed that preferentially [1100]-oriented GaN domains were grown without low-temperature nitridation or a buffer layer, and that the growth condition of preferentially [1100]-oriented GaN was insensitive to V/III ratio.

  7. Surface-enhanced Raman spectroscopy of cadmium sulfide/cadmium selenide superlattices formed on gold by electrochemical atomic-layer epitaxy

    NASA Astrophysics Data System (ADS)

    Zou, Shouzhong; Weaver, Michael J.

    1999-10-01

    The phonon properties of ultrathin CdS/CdSe superlattice films formed on gold by electrochemical atomic-layer epitaxy are characterized by means of surface-enhanced Raman spectroscopy (SERS). Substantial (15-25 cm -1) red-shifts in the CdS phonon frequencies are observed, whereas the CdSe frequencies are essentially unaltered, indicating that substantial crystallographic strain occurs in the former, but not the latter, superlattice component. The findings demonstrate the virtues of SERS for exploring the structure of such solid-solid interfaces with unique monolayer-level sensitivity.

  8. Two-Step Growth of (0001) ZnO Single-Crystal Layers on (0001) Sapphire Substrates by Halide Vapor Phase Epitaxy

    NASA Astrophysics Data System (ADS)

    Masuda, Rui; Togashi, Rie; Murakami, Hisashi; Kumagai, Yoshinao; Koukitu, Akinori

    2011-12-01

    The heteroepitaxial growth of (0001) ZnO on (0001) sapphire substrates by halide vapor phase epitaxy using a two-step growth procedure was investigated. X-ray diffraction analysis revealed that single-crystal (0001) ZnO layers on (0001) sapphire substrates were grown at 400 °C. High-temperature heteroepitaxy at 1000 °C on (0001) sapphire substrates was realized by two-step growth using the ZnO layer grown at 400 °C as a buffer layer. Two-dimensional layer growth at 1000 °C was realized on buffer layers thicker than 0.4 µm. Photoluminescence (PL) measurements performed at room temperature for the ZnO layer grown on the 0.4-µm-thick buffer layer showed a significant blueshift of near-band-edge emission (NBE). A thick buffer layer of 0.8 µm was found to be necessary for a successful two-step growth without a blueshift of NBE in the PL spectra, which is caused by a large compressive stress.

  9. GaN Epitaxial Layer Grown with Conductive Al(x)Ga(1-x)N Buffer Layer on SiC Substrate Using Metal Organic Chemical Vapor Deposition.

    PubMed

    So, Byeongchan; Lee, Kyungbae; Lee, Kyungjae; Heo, Cheon; Pyeon, Jaedo; Ko, Kwangse; Jang, Jongjin; Nam, Okhyun

    2016-05-01

    This study investigated GaN epitaxial layer growth with a conductive Al(x)Ga(1-x)N buffer layer on n-type 4H-SiC by high-temperature metalorganic chemical vapor deposition (HT-MOCVD). The Al composition of the Al(x)Ga(1-x)N buffer was varied from 0% to 100%. In terms of the crystal quality of the GaN layer, 79% Al was the optimal composition of the Al(x)Ga(1-x)N buffer layer in our experiment. A vertical conductive structure was fabricated to measure the current voltage (I-V) characteristics as a function of Al composition, and the I-V curves showed that the resistance increased with increasing Al concentration of the Al(x)Ga(1-x)N buffer layer. PMID:27483845

  10. Characterization of Stress Relaxation, Dislocations and Crystallographic Tilt Via X-ray Microdiffraction in GaN (0001) Layers Grown by Maskless Pendeo-Epitaxy

    SciTech Connect

    Barabash, Rozaliya; Ice, Gene E; Liu, Wenjun; Einfeldt, S.; Hommel, D.; Roskowski, A. M.; Davis, R. F.

    2005-01-01

    Intrinsic stresses due to lattice mismatch and high densities of threading dislocations and extrinsic stresses resulting from the mismatch in the coefficients of thermal expansion are present in almost all III-Nitride heterostructures. Stress relaxation in the GaN layers occurs in conventional and in pendeo-epitaxial films via the formation of additional misfit dislocations, domain boundaries, elastic strain and wing tilt. Polychromatic X-ray microdiffraction, high resolution monochromatic X-ray diffraction and finite element simulations have been used to determine the distribution of strain, dislocations, sub-boundaries and crystallographic wing tilt in uncoalesced and coalesced GaN layers grown by maskless pendeo-epitaxy. An important parameter was the width-to-height ratio of the etched columns of GaN from which the lateral growth of the wings occurred. The strain and tilt across the stripes increased with the width-to-height ratio. Tilt boundaries formed in the uncoalesced GaN layers at the column/wing interfaces for samples with a large ratio. Sharper tilt boundaries were observed at the interfaces formed by the coalescence of two laterally growing wings. The wings tilted upward during cooling to room temperature for both the uncoalesced and the coalesced GaN layers. It was determined that finite element simulations that account for extrinsic stress relaxation can explain the experimental results for uncoalesced GaN layers. Relaxation of both extrinsic and intrinsic stress components in the coalesced GaN layers contribute to the observed wing tilt and the formation of sub-boundaries.

  11. Characterization of Stress Relaxation, Dislocations and Crystallographic Tilt Via X-ray Microdiffraction in GaN (0001) Layers Grown by Maskless Pendeo-Epitaxy

    SciTech Connect

    Barabash, R.I.; Ice, G.E.; Liu, W.; Einfeldt, S.; Hommel, D.; Roskowski, A.M.; Davis, R.F.

    2010-06-25

    Intrinsic stresses due to lattice mismatch and high densities of threading dislocations and extrinsic stresses resulting from the mismatch in the coefficients of thermal expansion are present in almost all III-Nitride heterostructures. Stress relaxation in the GaN layers occurs in conventional and in pendeo-epitaxial films via the formation of additional misfit dislocations, domain boundaries, elastic strain and wing tilt. Polychromatic X-ray microdiffraction, high resolution monochromatic X-ray diffraction and finite element simulations have been used to determine the distribution of strain, dislocations, sub-boundaries and crystallographic wing tilt in uncoalesced and coalesced GaN layers grown by maskless pendeo-epitaxy. An important parameter was the width-to-height ratio of the etched columns of GaN from which the lateral growth of the wings occurred. The strain and tilt across the stripes increased with the width-to-height ratio. Tilt boundaries formed in the uncoalesced GaN layers at the column/wing interfaces for samples with a large ratio. Sharper tilt boundaries were observed at the interfaces formed by the coalescence of two laterally growing wings. The wings tilted upward during cooling to room temperature for both the uncoalesced and the coalesced GaN layers. It was determined that finite element simulations that account for extrinsic stress relaxation can explain the experimental results for uncoalesced GaN layers. Relaxation of both extrinsic and intrinsic stress components in the coalesced GaN layers contribute to the observed wing tilt and the formation of sub-boundaries.

  12. Enhancement of the quality of InAsSb epilayers using InAsSb graded and InSb buffer layers grown by hot wall epitaxy

    NASA Astrophysics Data System (ADS)

    Nakamura, S.; Jayavel, P.; Kobayashi, Y.; Arafune, K.; Koyama, T.; Kumagawa, M.; Hayakawa, Y.

    2005-10-01

    We have investigated the structural and electrical properties of InAsxSb1-x epilayers grown on GaAs(0 0 1) substrates by hot wall epitaxy. The epilayers were grown on an InAsSb graded layer and an InSb buffer layer. The arsenic composition (x) of the InAsxSb1-x epilayer was calculated using x-ray diffraction and found to be 0.5. The graded layers were grown with As temperature gradients of 2 and 0.5 °C min-1. The three-dimensional (3D) island growth due to the large lattice mismatch between InAsSb and GaAs was observed by scanning electron microscopy. As the thicknesses of the InAsSb graded layer and the InSb buffer layer are increased, a transition from 3D island growth to two-dimensional plateau-like growth is observed. The x-ray rocking curve measurements indicate that full-width at half-maximum values of the epilayers were decreased by using the graded and buffer layers. A dramatic enhancement of the electron mobility of the grown layers was observed by Hall effect measurements.

  13. Deep levels in a-plane, high Mg-content Mg{sub x}Zn{sub 1-x}O epitaxial layers grown by molecular beam epitaxy

    SciTech Connect

    Guer, Emre; Tabares, G.; Hierro, A.; Chauveau, J. M.

    2012-12-15

    Deep level defects in n-type unintentionally doped a-plane Mg{sub x}Zn{sub 1-x}O, grown by molecular beam epitaxy on r-plane sapphire were fully characterized using deep level optical spectroscopy (DLOS) and related methods. Four compositions of Mg{sub x}Zn{sub 1-x}O were examined with x = 0.31, 0.44, 0.52, and 0.56 together with a control ZnO sample. DLOS measurements revealed the presence of five deep levels in each Mg-containing sample, having energy levels of E{sub c} - 1.4 eV, 2.1 eV, 2.6 V, and E{sub v} + 0.3 eV and 0.6 eV. For all Mg compositions, the activation energies of the first three states were constant with respect to the conduction band edge, whereas the latter two revealed constant activation energies with respect to the valence band edge. In contrast to the ternary materials, only three levels, at E{sub c} - 2.1 eV, E{sub v} + 0.3 eV, and 0.6 eV, were observed for the ZnO control sample in this systematically grown series of samples. Substantially higher concentrations of the deep levels at E{sub v} + 0.3 eV and E{sub c} - 2.1 eV were observed in ZnO compared to the Mg alloyed samples. Moreover, there is a general invariance of trap concentration of the E{sub v} + 0.3 eV and 0.6 eV levels on Mg content, while at least and order of magnitude dependency of the E{sub c} - 1.4 eV and E{sub c} - 2.6 eV levels in Mg alloyed samples.

  14. Inhomogeneous distribution of defect-related emission in Si-doped AlGaN epitaxial layers with different Al content and Si concentration

    SciTech Connect

    Kurai, Satoshi Ushijima, Fumitaka; Yamada, Yoichi; Miyake, Hideto; Hiramatsu, Kazumasa

    2014-02-07

    The spatial distribution of luminescence in Si-doped AlGaN epitaxial layers that differ in Al content and Si concentration has been studied by cathodoluminescence (CL) mapping in combination with scanning electron microscopy. The density of surface hillocks increased with decreasing Al content and with increasing Si concentration. The mechanisms giving rise to those hillocks are likely different. The hillocks induced surface roughening, and the compositional fluctuation and local donor-acceptor-pair (DAP) emission at hillock edges in AlGaN epitaxial layers were enhanced irrespective of the origin of the hillocks. The intensity of local DAP emission was related to Si concentration, as well as to hillock density. CL observation revealed that DAP emission areas were present inside the samples and were likely related to dislocations concentrated at hillock edges. Possible candidates for acceptors in the observed DAP emission that are closely related in terms of both Si concentration and hillock edges with large deformations are a V{sub III}-Si{sub III} complex and Si{sub N}, which are unfavorable in ordinary III-nitrides.

  15. Reduction of structural defects in thick 4H-SiC epitaxial layers grown on 4° off-axis substrates

    NASA Astrophysics Data System (ADS)

    Yazdanfar, M.; Ivanov, I. G.; Pedersen, H.; Kordina, O.; Janzén, E.

    2013-06-01

    By carefully controlling the surface chemistry of the chemical vapor deposition process for silicon carbide (SiC), 100 μm thick epitaxial layers with excellent morphology were grown on 4° off-axis SiC substrates at growth rates exceeding 100 μm/h. In order to reduce the formation of step bunching and structural defects, mainly triangular defects, the effect of varying parameters such as growth temperature, C/Si ratio, Cl/Si ratio, Si/H2 ratio, and in situ pre-growth surface etching time are studied. It was found that an in-situ pre growth etch at growth temperature and pressure using 0.6% HCl in hydrogen for 12 min reduced the structural defects by etching preferentially on surface damages of the substrate surface. By then applying a slightly lower growth temperature of 1575 °C, a C/Si ratio of 0.8, and a Cl/Si ratio of 5, 100 μm thick, step-bunch free epitaxial layer with a minimum triangular defect density and excellent morphology could be grown, thus enabling SiC power device structures to be grown on 4° off axis SiC substrates.

  16. Chloride-based CVD of 3C-SiC Epitaxial Layers on On-axis 6H (0001) SiC Substrates

    NASA Astrophysics Data System (ADS)

    Leone, Stefano; Beyer, Franziska C.; Henry, Anne; Kordina, Olof; Janzén, Erik

    2010-11-01

    The growth of 3C-SiC epitaxial layers on nominally on-axis 6H-SiC Si-face substrates using the chloride-based CVD process is demonstrated. A hot-wall CVD reactor was used and HCl was added to the standard precursors (silane and ethylene). Several growth parameters were tested: temperature, in-situ surface preparation, C/Si ratio, Cl/Si ratio, and nitrogen addition. Each parameter had a very important effect on the polytype formation. In the case of 3C-SiC deposition the morphology and typology of defects could change significantly depending on the different combinations of growth conditions, including the addition of nitrogen. At a growth rate of 10 μm/h, a mirror-like surface with a single domain decorated by some parallel stripes and few epitaxial defects were obtained. The near-band gap luminescence of high quality 3C-SiC layers was characterized by very sharp lines. Microscope and AFM analysis showed a very smooth surface. A background doping in the low 1015 cm-3 range was achieved.

  17. Epitaxial growth of large area single-crystalline few-layer MoS2 with high space charge mobility of 192 cm2 V-1 s-1

    NASA Astrophysics Data System (ADS)

    Ma, Lu; Nath, Digbijoy N.; Lee, Edwin W.; Lee, Choong Hee; Yu, Mingzhe; Arehart, Aaron; Rajan, Siddharth; Wu, Yiying

    2014-08-01

    We report on the vapor-solid growth of single crystalline few-layer MoS2 films on (0001)-oriented sapphire with excellent structural and electrical properties over centimeter length scale. High-resolution X-ray diffraction scans indicated that the films had good out-of-plane ordering and epitaxial registry. A carrier density of ˜2 × 1011 cm-2 and a room temperature mobility of 192 cm2/Vs were extracted from space-charge limited transport regime in the films. The electron mobility was found to exhibit in-plane anisotropy with a ratio of ˜1.8. Theoretical estimates of the temperature-dependent electron mobility including optical phonon, acoustic deformation potential, and remote ionized impurity scattering were found to satisfactorily match the measured data. The synthesis approach reported here demonstrates the feasibility of device quality few-layer MoS2 films with excellent uniformity and high quality.

  18. Epitaxial technology for low cost solar cells

    NASA Technical Reports Server (NTRS)

    Kressel, H.; Raccah, P. M.

    1975-01-01

    Epitaxial solar cell structures on low cost silicon substrates are compared to direct diffusion substrates. Dislocation density in the epitaxial layers is found to be significantly lower than that of the substrate material. The saturation current density of diodes epitaxially formed on the substrate is commonly 2 to 3 orders of magnitude lower than for diodes formed by direct diffusion. Solar cells made epitaxially are substantially better than those made by direct diffusion into similar material.

  19. Surface segregation as a means of gettering Cu in liquid-phase-epitaxy silicon thin layers grown from Al-Cu-Si solutions

    SciTech Connect

    Wang, T.H.; Ciszek, T.F.; Reedy, R.; Asher, S.; King, D.

    1996-05-01

    The authors demonstrate that, by using the natural surface segregation phenomenon, Cu can be gettered to the surface from the bulk of silicon layers so that its concentrations in the liquid-phase-epitaxy (LPE) layers are much lower than its solubility at the layer growth temperature and the reported 10{sup 17} cm{sup {minus}3} degradation threshold for solar-cell performance. Secondary-ion mass spectroscopy (SIMS) analysis indicates that, within a micron-deep sub-surface region, Cu accumulates even in as-grown LPE samples. Slower cooling after growth to room temperature enhances this Cu enrichment. X-ray photoelectron spectroscopy (XPS) measurement shows as much as 3.2% Cu in a surface region of about 50 {Angstrom}. More surface-sensitive, ion-scattering spectroscopy (ISS) analysis further reveals about 7% of Cu at the top surface. These results translate to an areal gettering capacity of about 1.0 x 10{sup 16} cm{sup {minus}2}, which is higher than the available total-area density of Cu in the layer and substrate (3.6 x 10{sup 15} cm{sup {minus}2} for a uniform 1.2 x 10{sup 17}cm{sup {minus}3} Cu throughout the layer and substrate with a total thickness of 300 {mu}m).

  20. Dislocation blocking by AlGaN hot electron injecting layer in the epitaxial growth of GaN terahertz Gunn diode

    NASA Astrophysics Data System (ADS)

    Li, Liang; Yang, Lin'an; Zhang, Jincheng; Hao, Yue

    2013-09-01

    This paper reports an efficient method to improve the crystal quality of GaN Gunn diode with AlGaN hot electron injecting layer (HEI). An evident reduction of screw dislocation and edge dislocation densities is achieved by the strain management and the enhanced lateral growth in high temperature grown AlGaN HEI layer. Compared with the top hot electron injecting layer (THEI) structure, the bottom hot electron injecting layer (BHEI) structure enhances the crystal quality of transit region due to the growth sequence modulation of HEI layer. A high Hall mobility of 2934 cm2/Vs at 77 K, a nearly flat downtrend of Hall mobility at the temperature ranging from 300 to 573 K, a low intensity of ratio of yellow luminescence band to band edge emission, a narrow band edge emission line-width, and a smooth surface morphology are observed for the BHEI structural epitaxy of Gunn diode, which indicates that AlGaN BHEI structure is a promising candidate for fabrication of GaN Gunn diodes in terahertz regime.

  1. Properties of YBCO on LaMnO3-capped IBAD MgO-templates without Homo-epitaxial MgO layer.

    SciTech Connect

    Aytug, Tolga; Paranthaman, Mariappan Parans; Kim, Kyunghoon; Zhang, Yifei; Cantoni, Claudia; Zuev, Yuri L; Goyal, Amit; Thompson, James R; Christen, David K

    2009-01-01

    Previously, it has been well established that in an IBAD architecture for coated conductors, (1) LaMnO3 (LMO) buffer layers are structurally and chemically compatible with an underlying homo-epitaxial MgO layer and (2) high current density YBCO films can be grown on these LMO templates. In the present work, the homo-epi MgO layer has been successfully eliminated and a LMO cap layer was grown directly on the IBAD (MgO) template. The performance of the LMO/IBAD (MgO) samples has been qualified by depositing 1 m-thick YBCO coatings by pulsed laser deposition. Electrical transport measurements of YBCO films on the standard (with homo-epi MgO) and simplified (without homo-epi MgO) IBAD architectures were carried out. The angular dependencies of critical current density (Jc) are similar for both IBAD architectures. XRD measurements indicate good, c-axis aligned YBCO films. Transmission electron microscopy (TEM) images reveal that microstructures of YBCO/LMO/IBAD (MgO) and YBCO/LMO/homo-epi MgO/IBAD (MgO) templates are similar. These results demonstrate the strong potential of using LMO as a single cap layer directly on IBAD (MgO) for the development of a simplified IBAD architecture.

  2. Atomic Layer Deposition of p-Type Epitaxial Thin Films of Undoped and N-Doped Anatase TiO2.

    PubMed

    Vasu, K; Sreedhara, M B; Ghatak, J; Rao, C N R

    2016-03-01

    Employing atomic layer deposition, we have grown p-type epitaxial undoped and N-doped anatase TiO2(001) thin films on c-axis Al2O3 substrate. From X-ray diffraction and transmission electron microscopy studies, crystallographic relationships between the film and the substrate are found to be (001)TiO2//(0001)Al2O3 and [1̅10]TiO2//[011̅0]Al2O3. N-doping in TiO2 thin films enhances the hole concentration and mobility. The optical band gap of anatase TiO2 (3.23 eV) decreases to 3.07 eV upon N-doping. The epitaxial films exhibit room-temperature ferromagnetism and photoresponse. A TiO2-based homojunction diode was fabricated with rectification from the p-n junction formed between N-doped p-TiO2 and n-TiO2. PMID:26963716

  3. Atomic layer epitaxy of Ruddlesden-Popper SrO(SrTiO{sub 3}){sub n} films by means of metalorganic aerosol deposition

    SciTech Connect

    Jungbauer, M.; Hühn, S.; Moshnyaga, V.; Egoavil, R.; Tan, H.; Verbeeck, J.; Van Tendeloo, G.

    2014-12-22

    We report an atomic layer epitaxial growth of Ruddlesden-Popper (RP) thin films of SrO(SrTiO{sub 3}){sub n} (n = ∞, 2, 3, 4) by means of metalorganic aerosol deposition (MAD). The films are grown on SrTiO{sub 3}(001) substrates by means of a sequential deposition of Sr-O/Ti-O{sub 2} atomic monolayers, monitored in-situ by optical ellipsometry. X-ray diffraction and transmission electron microscopy (TEM) reveal the RP structure with n = 2–4 in accordance with the growth recipe. RP defects, observed by TEM in a good correlation with the in-situ ellipsometry, mainly result from the excess of SrO. Being maximal at the film/substrate interface, the SrO excess rapidly decreases and saturates after 5–6 repetitions of the SrO(SrTiO{sub 3}){sub 4} block at the level of 2.4%. This identifies the SrTiO{sub 3} substrate surface as a source of RP defects under oxidizing conditions within MAD. Advantages and limitations of MAD as a solution-based and vacuum-free chemical deposition route were discussed in comparison with molecular beam epitaxy.

  4. Atomic Layer Deposition of p-Type Epitaxial Thin Films of Undoped and N-Doped Anatase TiO2.

    PubMed

    Vasu, K; Sreedhara, M B; Ghatak, J; Rao, C N R

    2016-03-01

    Employing atomic layer deposition, we have grown p-type epitaxial undoped and N-doped anatase TiO2(001) thin films on c-axis Al2O3 substrate. From X-ray diffraction and transmission electron microscopy studies, crystallographic relationships between the film and the substrate are found to be (001)TiO2//(0001)Al2O3 and [1̅10]TiO2//[011̅0]Al2O3. N-doping in TiO2 thin films enhances the hole concentration and mobility. The optical band gap of anatase TiO2 (3.23 eV) decreases to 3.07 eV upon N-doping. The epitaxial films exhibit room-temperature ferromagnetism and photoresponse. A TiO2-based homojunction diode was fabricated with rectification from the p-n junction formed between N-doped p-TiO2 and n-TiO2.

  5. Towards defect-free epitaxial CdTe and MgCdTe layers grown on InSb (001) substrates

    NASA Astrophysics Data System (ADS)

    Lu, Jing; DiNezza, Michael J.; Zhao, Xin-Hao; Liu, Shi; Zhang, Yong-Hang; Kovacs, Andras; Dunin-Borkowski, Rafal E.; Smith, David J.

    2016-04-01

    A series of three CdTe/MgxCd1-xTe (x~0.24) double heterostructures grown by molecular beam epitaxy on InSb (001) substrates at temperatures in the range of 235-295 °C have been studied using conventional and advanced electron microscopy techniques. Defect analysis based on bright-field electron micrographs indicates that the structure grown at 265 °C has the best structural quality of the series, while structures grown at 30 °C lower or higher temperature show highly defective morphology. Geometric phase analysis of the CdTe/InSb interface for the sample grown at 265 °C reveals minimal interfacial elastic strain, and there is no visible evidence of interfacial defect formation in aberration-corrected electron micrographs of this particular sample. Such high quality CdTe epitaxial layers should provide the basis for applications such as photo-detectors and multi-junction solar cells.

  6. Liquid phase epitaxy of binary III–V nanocrystals in thin Si layers triggered by ion implantation and flash lamp annealing

    SciTech Connect

    Wutzler, Rene Rebohle, Lars; Prucnal, Slawomir; Bregolin, Felipe L.; Hübner, Rene; Voelskow, Matthias; Helm, Manfred; Skorupa, Wolfgang

    2015-05-07

    The integration of III–V compound semiconductors in Si is a crucial step towards faster and smaller devices in future technologies. In this work, we investigate the formation process of III–V compound semiconductor nanocrystals, namely, GaAs, GaSb, and InP, by ion implantation and sub-second flash lamp annealing in a SiO{sub 2}/Si/SiO{sub 2} layer stack on Si grown by plasma-enhanced chemical vapor deposition. Raman spectroscopy, Rutherford Backscattering spectrometry, and transmission electron microscopy were performed to identify the structural and optical properties of these structures. Raman spectra of the nanocomposites show typical phonon modes of the compound semiconductors. The formation process of the III–V compounds is found to be based on liquid phase epitaxy, and the model is extended to the case of an amorphous matrix without an epitaxial template from a Si substrate. It is shown that the particular segregation and diffusion coefficients of the implanted group-III and group-V ions in molten Si significantly determine the final appearance of the nanostructure and thus their suitability for potential applications.

  7. Magnetic and dielectric properties of layered perovskite Gd2Ti2O7 thin film epitaxially stabilized on a perovskite single crystal

    NASA Astrophysics Data System (ADS)

    Ukita, Takashi; Hirose, Yasushi; Ohno, Sawako; Hatabayashi, Kunitada; Fukumura, Tomoteru; Hasegawa, Tetsuya

    2012-04-01

    Layered perovskite (LP) titanates, Ln2Ti2O7 (Ln = lanthanoids), are ferroelectric materials containing magnetic Ln3+ ions at A-site. Metastable LP-Gd2Ti2O7 was fabricated in epitaxial thin film form on lattice-matched perovskite substrates and its dielectric and magnetic properties were investigated. The (100)-oriented LP-Gd2Ti2O7 films were epitaxially grown on (110) plane of (LaAlO3)0.3-(SrAl0.5Ta0.5O3)0.7 (LSAT) and Nb-doped SrTiO3 by using a pulsed laser deposition method. Piezoresponse force microscope measurements revealed that LP-Gd2Ti2O7 has spontaneous polarization along the b-axis at room temperature, strongly suggesting room temperature ferroelectricity. Magnetization measurements showed paramagnetic behavior with weak antiferromagnetic interaction around 2 K. Small positive magneto-dielectric effect (Δɛ/ɛ ˜ 10-5 order) was also confirmed at 10 K.

  8. Integration and structural analysis of strain relaxed bi-epitaxial zinc oxide(0001) thin film with silicon(100) using titanium nitride buffer layer

    SciTech Connect

    Gupta, Pranav; Narayan, Jagdish

    2014-01-28

    Epitaxial growth of c-plane ZnO(0001) has been demonstrated on the Si(001) by using TiN as an intermediate buffer layer. Because of different out of plane symmetry of the substrate (Si/TiN) and the film (ZnO), two orientations of ZnO domains were obtained and the ZnO film growth is of bi-epitaxial nature. The ZnO thin film was observed to be nearly strain relaxed from X-ray and Raman measurements. The interface between the ZnO and TiN was investigated by transmission electron microscopy, and atomic arrangement has been modeled to understand the crystallographic orientation and structure of the domain/grain boundaries. Reaction at ZnO/TiN interface at higher growth temperature causing zinc titanate formation was observed. The grain boundary structure between the observed domains investigated by scanning transmission electron microscopy, revealed the ZnO(0001) planes to be contiguous across the grain boundary which is significant from the perspective of conduction electron scattering. In this configuration, the TiN (being electrically conductive) can be effectively used as an electrode for novel vertically integrated device applications (like light emitting diodes) directly on Si(100) substrate.

  9. Tellurium doping of Ga{sub 0.8}In{sub 0.2}Sb layers grown by metalorganic vapor phase epitaxy

    SciTech Connect

    Ehsani, H.; Bhat, I.; Hitchcock, C.; Gutmann, R.J.; Charache, G.; Freeman, M.

    1998-06-01

    N-type Ga{sub 0.8}In{sub 0.2}Sb epitaxial layers have been grown on GaSb and GaAs substrates by metalorganic vapor phase epitaxy (MOVPE) using diethyltelluride (DETe) as the dopant source. The incorporation efficiency of Te in Ga{sub 0.8}In{sub 0.2}Sb and the electron mobility were found to be higher with GaSb substrates compared to using GaAs substrates. The electron concentration increased from 5 {times} 10{sup 16} cm{sup {minus}3} to 1.5 {times} 10{sup 18} cm{sup {minus}3} as the Te concentration was increased from 1 {times} 10{sup 17} cm{sup {minus}3} to 5 {times} 10{sup 18} cm{sup {minus}3}. As the Te concentration was increased further, the electron concentration decreased, with only about 1% of the Te electrically active at a Te concentration of 2 {times} 10{sup 20} cm{sup {minus}3}.

  10. Characterisation of epitaxial TiO 2 thin films grown on MgO(0 0 1) using atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Mitchell, D. R. G.; Attard, D. J.; Triani, G.

    2005-11-01

    Thin films of TiO 2 have been deposited onto MgO(0 0 1) substrates using atomic layer deposition at 300 °C. Plan and cross-sectional transmission electron microscopy (TEM), X-ray diffraction and atomic force microscopy have been used to understand the nature of the films. X-ray and electron diffraction showed that a polycrystalline, epitaxial anatase film was produced. The c-axis of the anatase was parallel to the MgO(0 0 1) surface with two orientational variants at right angles to each other in the plane of the film, each aligned with an MgO cube axis. Plan-view and cross-sectional TEM showed that the grain structure of the film reflected this orientation relationship, with the grain morphology comprising two sets of roughly tetragonal grains. Also present was a small fraction of equiaxed, anatase grains which were randomly oriented. Roughness measurement using atomic force microscopy showed that the epitaxial anatase films were quite smooth, in comparison to equivalent non-aligned films grown on silicon.

  11. Epitaxial thin films

    DOEpatents

    Hunt, Andrew Tye; Deshpande, Girish; Lin, Wen-Yi; Jan, Tzyy-Jiuan

    2006-04-25

    Epitatial thin films for use as buffer layers for high temperature superconductors, electrolytes in solid oxide fuel cells (SOFC), gas separation membranes or dielectric material in electronic devices, are disclosed. By using CCVD, CACVD or any other suitable deposition process, epitaxial films having pore-free, ideal grain boundaries, and dense structure can be formed. Several different types of materials are disclosed for use as buffer layers in high temperature superconductors. In addition, the use of epitaxial thin films for electrolytes and electrode formation in SOFCs results in densification for pore-free and ideal gain boundary/interface microstructure. Gas separation membranes for the production of oxygen and hydrogen are also disclosed. These semipermeable membranes are formed by high-quality, dense, gas-tight, pinhole free sub-micro scale layers of mixed-conducting oxides on porous ceramic substrates. Epitaxial thin films as dielectric material in capacitors are also taught herein. Capacitors are utilized according to their capacitance values which are dependent on their physical structure and dielectric permittivity. The epitaxial thin films of the current invention form low-loss dielectric layers with extremely high permittivity. This high permittivity allows for the formation of capacitors that can have their capacitance adjusted by applying a DC bias between their electrodes.

  12. Direct observation of strain in InAs quantum dots and cap layer during molecular beam epitaxial growth using in situ X-ray diffraction

    SciTech Connect

    Shimomura, Kenichi; Ohshita, Yoshio; Kamiya, Itaru; Suzuki, Hidetoshi; Sasaki, Takuo; Takahasi, Masamitu

    2015-11-14

    Direct measurements on the growth of InAs quantum dots (QDs) and various cap layers during molecular beam epitaxy are performed by in situ X-ray diffraction (XRD). The evolution of strain induced both in the QDs and cap layers during capping is discussed based on the XRD intensity transients obtained at various lattice constants. Transients with different features are observed from those obtained during InGaAs and GaAs capping. The difference observed is attributed to In-Ga intermixing between the QDs and the cap layer under limited supply of In. Photoluminescence (PL) wavelength can be tuned by controlling the intermixing, which affects both the strain induced in the QDs and the barrier heights. The PL wavelength also varies with the cap layer thickness. A large redshift occurs by reducing the cap thickness. The in situ XRD observation reveals that this is a result of reduced strain. We demonstrate how such information about strain can be applied for designing and preparing novel device structures.

  13. Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs.

    PubMed

    Shih, Huan-Yu; Shiojiri, Makoto; Chen, Ching-Hsiang; Yu, Sheng-Fu; Ko, Chung-Ting; Yang, Jer-Ren; Lin, Ray-Ming; Chen, Miin-Jang

    2015-09-02

    High threading dislocation (TD) density in GaN-based devices is a long unresolved problem because of the large lattice mismatch between GaN and the substrate, which causes a major obstacle for the further improvement of next-generation high-efficiency solid-state lighting and high-power electronics. Here, we report InGaN/GaN LEDs with ultralow TD density and improved efficiency on a sapphire substrate, on which a near strain-free GaN compliant buffer layer was grown by remote plasma atomic layer deposition. This "compliant" buffer layer is capable of relaxing strain due to the absorption of misfit dislocations in a region within ~10 nm from the interface, leading to a high-quality overlying GaN epilayer with an unusual TD density as low as 2.2 × 10(5) cm(-2). In addition, this GaN compliant buffer layer exhibits excellent uniformity up to a 6" wafer, revealing a promising means to realize large-area GaN hetero-epitaxy for efficient LEDs and high-power transistors.

  14. Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs

    PubMed Central

    Shih, Huan-Yu; Shiojiri, Makoto; Chen, Ching-Hsiang; Yu, Sheng-Fu; Ko, Chung-Ting; Yang, Jer-Ren; Lin, Ray-Ming; Chen, Miin-Jang

    2015-01-01

    High threading dislocation (TD) density in GaN-based devices is a long unresolved problem because of the large lattice mismatch between GaN and the substrate, which causes a major obstacle for the further improvement of next-generation high-efficiency solid-state lighting and high-power electronics. Here, we report InGaN/GaN LEDs with ultralow TD density and improved efficiency on a sapphire substrate, on which a near strain-free GaN compliant buffer layer was grown by remote plasma atomic layer deposition. This “compliant” buffer layer is capable of relaxing strain due to the absorption of misfit dislocations in a region within ~10 nm from the interface, leading to a high-quality overlying GaN epilayer with an unusual TD density as low as 2.2 × 105 cm−2. In addition, this GaN compliant buffer layer exhibits excellent uniformity up to a 6” wafer, revealing a promising means to realize large-area GaN hetero-epitaxy for efficient LEDs and high-power transistors. PMID:26329829

  15. Control of hydrogen and carbon impurity inclusion during the growth of GaAsN thin film by atomic layer epitaxy

    NASA Astrophysics Data System (ADS)

    Yokoyama, Yuki; Fukuyama, Atsuhiko; Haraguchi, Tomohiro; Yamauchi, Toshihiro; Ikari, Tetsuo; Suzuki, Hidetoshi

    2016-01-01

    The effects of growth temperature and nitrogen (N) source duration on N, carbon (C), and hydrogen (H) concentrations in GaAsN layers grown by atomic layer epitaxy (ALE) were investigated to understand the incorporation mechanisms of these atoms. In addition, the effects of the above growth conditions on the self-limiting mechanism (SLM) were investigated. The SLM was in effect at growth temperatures of 500 and 520 °C. The origin of the residual C was not N but other sources. With increasing N source duration, the N and H concentrations increased and saturated. The N incorporation mechanisms were discussed by a simple model considering the absorption and desorption of N atoms on the gallium (Ga)-covered surface. H atoms originating from the N source were incorporated in to the GaAsN layer. According to the ratio of the H concentration to the N concentration, the difference in the incorporation processes of N and H atoms in ALE-grown GaAsN layers was discussed.

  16. Epitaxial ZnO/LiNbO{sub 3}/ZnO stacked layer waveguide for application to thin-film Pockels sensors

    SciTech Connect

    Akazawa, Housei Fukuda, Hiroshi

    2015-05-15

    We produced slab waveguides consisting of a LiNbO{sub 3} (LN) core layer that was sandwiched with Al-doped ZnO cladding layers. The ZnO/LN/ZnO stacked layers were grown on sapphire C-planes by electron cyclotron resonance (ECR) plasma sputtering and were subjected to structural, electrical, and optical characterizations. X-ray diffraction confirmed that the ZnO and LN layers were epitaxial without containing misoriented crystallites. The presence of 60°-rotational variants of ZnO and LN crystalline domains were identified from X-ray pole figures. Cross-sectional transmission electron microscopy images revealed a c-axis orientated columnar texture for LN crystals, which ensured operation as electro-optic sensors based on optical anisotropy along longitudinal and transversal directions. The interfacial roughness between the LN core and ZnO bottom layers as well as that between the ZnO top and the LN core layers was less than 20 nm, which agreed with surface images observed with atomic force microscopy. Outgrowth of triangular LN crystalline domains produced large roughness at the LN film surface. The RMS roughness of the LN film surface was twice that of the same structure grown on sapphire A-planes. Vertical optical transmittance of the stacked films was higher than 85% within the visible and infrared wavelength range. Following the approach adopted by Teng and Man [Appl. Phys. Lett. 56, 1734 (1990)], ac Pockels coefficients of r{sub 33} = 24-28 pm/V were derived for c-axis oriented LN films grown on low-resistive Si substrates. Light propagation within a ZnO/LN/ZnO slab waveguide as well as within a ZnO single layer waveguide was confirmed. The birefringence of these waveguides was 0.11 for the former and 0.05 for the latter.

  17. Epitaxial ZnO/LiNbO3/ZnO stacked layer waveguide for application to thin-film Pockels sensors

    NASA Astrophysics Data System (ADS)

    Akazawa, Housei; Fukuda, Hiroshi

    2015-05-01

    We produced slab waveguides consisting of a LiNbO3 (LN) core layer that was sandwiched with Al-doped ZnO cladding layers. The ZnO/LN/ZnO stacked layers were grown on sapphire C-planes by electron cyclotron resonance (ECR) plasma sputtering and were subjected to structural, electrical, and optical characterizations. X-ray diffraction confirmed that the ZnO and LN layers were epitaxial without containing misoriented crystallites. The presence of 60°-rotational variants of ZnO and LN crystalline domains were identified from X-ray pole figures. Cross-sectional transmission electron microscopy images revealed a c-axis orientated columnar texture for LN crystals, which ensured operation as electro-optic sensors based on optical anisotropy along longitudinal and transversal directions. The interfacial roughness between the LN core and ZnO bottom layers as well as that between the ZnO top and the LN core layers was less than 20 nm, which agreed with surface images observed with atomic force microscopy. Outgrowth of triangular LN crystalline domains produced large roughness at the LN film surface. The RMS roughness of the LN film surface was twice that of the same structure grown on sapphire A-planes. Vertical optical transmittance of the stacked films was higher than 85% within the visible and infrared wavelength range. Following the approach adopted by Teng and Man [Appl. Phys. Lett. 56, 1734 (1990)], ac Pockels coefficients of r33 = 24-28 pm/V were derived for c-axis oriented LN films grown on low-resistive Si substrates. Light propagation within a ZnO/LN/ZnO slab waveguide as well as within a ZnO single layer waveguide was confirmed. The birefringence of these waveguides was 0.11 for the former and 0.05 for the latter.

  18. Mechanism for persistent hexagonal island formation in AlN buffer layer during growth on Si (111) by plasma-assisted molecular beam epitaxy

    SciTech Connect

    Hsu, K.-Y.; Chung, H.-C.; Liu, C.-P.; Tu, L.-W.

    2007-05-21

    The characteristics of structure and morphology of AlN grown by a growth interruption method on Si (111) with plasma-assisted molecular beam epitaxy are investigated. It is found that the growth interruption method would improve the surface flatness of the AlN layer without the formation of Al droplets. However, AlN hexagonal islands were present and persistent throughout the entire growth owing to effective strain relaxation and Eherlich-Schowebel barrier effect of preexistent surface islands grown on higher terraces of the Si substrate. The density of threading dislocations underneath the hexagonal islands is much less than elsewhere in the film, which is presumably due to dislocation annihilation during the island growth process.

  19. Non-destructive observation of in-grown stacking faults in 4H-SiC epitaxial layer using mirror electron microscope

    SciTech Connect

    Hasegawa, Masaki; Ohno, Toshiyuki

    2011-10-01

    Mirror electron microscope (MEM) observation has been conducted for a 4-{mu}m-thick n-doped 4H-SiC epitaxial layer. If the sample is simultaneously illuminated with ultraviolet (UV) light of a slightly greater energy than the bandgap energy of 4H-SiC, in-grown stacking faults (IGSFs) can be clearly observed in MEM images. These observations were performed non-destructively, as almost all irradiated electrons returned without impinging the sample surface due to the negative voltage applied to the sample. High spatial resolution observation via MEM showed that multiple IGSFs were stacked up. The phenomenon in which the contrast of the IGSFs vanished in the absence of UV illumination and under UV illumination with a lower energy than the bandgap energy revealed that the origin of the contrast was the negative charging of IGSFs trapping electrons excited by UV light.

  20. Local Strain, Defects and Crystallographic Tilt in GaN(0001) Layers Grown by Maskless Pendeo-epitaxy from X-ray Microdiffraction

    SciTech Connect

    Barabash, R.I.; Ice, G.E.; Liu, W.; Einfeldt, S.; Roskovski, A.M.; Davis, R.F.

    2010-07-13

    Polychromatic x-ray microdiffraction, high-resolution monochromatic x-ray diffraction, and finite element simulations have been used to determine the distribution of strain, defects, and crystallographic tilt in uncoalesced GaN layers grown by maskless pendeo-epitaxy. An important materials parameter was the width-to-height ratio of the etched columns of GaN from which occurred the lateral growth of the wings. Tilt boundaries formed at the column/wing interface for samples with a large ratio. Formation of the tilt boundary can be avoided by using smaller ratios. The strain and tilt across the stripe increased with the width-to-height ratio. The wings were tilted upward at room temperature.

  1. Low temperature p-type doping of (Al)GaN layers using ammonia molecular beam epitaxy for InGaN laser diodes

    SciTech Connect

    Malinverni, M. Lamy, J.-M.; Martin, D.; Grandjean, N.; Feltin, E.; Dorsaz, J.; Castiglia, A.; Rossetti, M.; Duelk, M.; Vélez, C.

    2014-12-15

    We demonstrate state-of-the-art p-type (Al)GaN layers deposited at low temperature (740 °C) by ammonia molecular beam epitaxy (NH{sub 3}-MBE) to be used as top cladding of laser diodes (LDs) with the aim of further reducing the thermal budget on the InGaN quantum well active region. Typical p-type GaN resistivities and contact resistances are 0.4 Ω cm and 5 × 10{sup −4} Ω cm{sup 2}, respectively. As a test bed, we fabricated a hybrid laser structure emitting at 400 nm combining n-type AlGaN cladding and InGaN active region grown by metal-organic vapor phase epitaxy, with the p-doped waveguide and cladding layers grown by NH{sub 3}-MBE. Single-mode ridge-waveguide LD exhibits a threshold voltage as low as 4.3 V for an 800 × 2 μm{sup 2} ridge dimension and a threshold current density of ∼5 kA cm{sup −2} in continuous wave operation. The series resistance of the device is 6 Ω and the resistivity is 1.5 Ω cm, confirming thereby the excellent electrical properties of p-type Al{sub 0.06}Ga{sub 0.94}N:Mg despite the low growth temperature.

  2. Assessing the influence of the vertical epitaxial layer design on the lateral beam quality of high-power broad area diode lasers

    NASA Astrophysics Data System (ADS)

    Winterfeldt, M.; Rieprich, J.; Knigge, S.; Maaßdorf, A.; Hempel, M.; Kernke, R.; Tomm, J. W.; Erbert, G.; Crump, P.

    2016-03-01

    GaAs-based high-power broad-area diode lasers deliver optical output powers Popt > 10W with efficiency > 60%. However, their application is limited due to poor in-plane beam parameter product BPPlat=0.25×Θ95%×w95% (Θ95% and w95% are emission angle and aperture, 95% power content). We present experimental investigations on λ = 9xx nm broad area lasers that aim to identify regulating factors of the BPPlat connected to the epitaxial layer design. First, we assess the thermal lens of vertical designs with varying asymmetry, using thermal camera images to determine its strength. Under study are an extreme-double-asymmetric (EDAS) vertical structure and a reference (i.e. more symmetric) design. The lateral thermal profiles clearly show that BPPlat increase is correlated to the bowing of the thermal lens. The latter is derived out of a quadratic temperature fit in the active region beneath the current injection of the laser device and depends on the details of the epitaxial layers. Second, we test the benefit of low modal gain factor Γg0, predicted to improve BPPlat via a suppression of filamentation. EDAS-based lasers with single quantum well (SQW) and double quantum well (DQW) active regions were compared, with 2.5x reduced Γg0, for 2.2x reduced filament gain. However, no difference is seen in measured BPPlat, giving evidence that filamentary processes are no longer a limit. In contrast, devices with lower Γg0 demonstrate an up to twofold reduced near field modulation depth, potentially enabling higher facet loads and increased device facet reliability, when operated near to the COD limit.

  3. Strain states of AlN/GaN-stress mitigating layer and their effect on GaN buffer layer grown by ammonia molecular beam epitaxy on 100-mm Si(111)

    SciTech Connect

    Ravikiran, L.; Radhakrishnan, K.; Agrawal, M.; Dharmarasu, N.; Munawar Basha, S.

    2013-09-28

    The effect of strain states of AlN/GaN-stress mitigating layer (SML) on buried crack density and its subsequent influence on the residual stresses in GaN buffer layers grown using ammonia-molecular beam epitaxy on 100-mm Si(111) substrate has been investigated. Different stages involved in the formation of buried cracks, which are crack initialization, growth of relaxed AlN layer, and subsequent lateral over growth, are identified using in-situ curvature measurements. While the increase of GaN thickness in AlN/GaN-SML enhanced its compressive strain relaxation and resulted in reduced buried crack spacing, the variation of AlN thickness did not show any effect on the crack spacing. Moreover, the decrease in the crack spacing (or increase in the buried crack density) was found to reduce the residual compression in 1st and 2nd GaN layers of AlN/GaN-SML structure. The higher buried crack density relaxed the compressive strain in 1st GaN layer, which further reduced its ability to compensate the tensile stress generated during substrate cool down, and hence resulted in lower residual compressive stress in 2nd GaN layer.

  4. Growth of epitaxial Y 2O 3 buffer layers on biaxially textured Ni-W substrates for YBCO coated conductors by MOD approach

    NASA Astrophysics Data System (ADS)

    Bhuiyan, M. S.; Paranthaman, M.; Kang, S.; Lee, D. F.; Salama, K.

    2005-06-01

    We have grown epitaxial Y 2O 3 buffer layers on biaxially textured Ni-W substrates for YBCO coated conductors using a newly developed metal organic decomposition (MOD) approach. Y 2O 3 precursor solution of 0.25 M concentration was spin coated on short samples of Ni-3 at.%W (Ni-W) substrates and heat-treated at 1150 °C in a gas mixture of Ar-4% H 2 for an hour. Detailed X-ray studies indicate that Y 2O 3 films have good out-of-plane and in-plane textures with full-width-half-maximum values of 6.22° and 7.51°, respectively. SEM and AFM investigations of Y 2O 3 films reveal a fairly dense and smooth microstructure without cracks and porosity. Highly textured YSZ barrier layers and CeO 2 cap layers were deposited on MOD Y 2O 3-buffered Ni-W substrates using rf-magnetron sputtering. Pulsed laser deposition was used to grow YBCO films on these substrates. A critical current, Jc, of about 1.21 MA/cm 2 at 77 K and self-field was obtained on YBCO (PLD)/CeO 2 (sputtered)/YSZ (sputtered)/Y 2O 3 (spin-coated)/Ni-W.

  5. MOD approach for the growth of epitaxial CeO2 buffer layers on biaxially textured Ni W substrates for YBCO coated conductors

    NASA Astrophysics Data System (ADS)

    Bhuiyan, M. S.; Paranthaman, M.; Sathyamurthy, S.; Aytug, T.; Kang, S.; Lee, D. F.; Goyal, A.; Payzant, E. A.; Salama, K.

    2003-11-01

    We have grown epitaxial CeO2 buffer layers on biaxially textured Ni-W substrates for YBCO coated conductors using a newly developed metal organic decomposition (MOD) approach. Precursor solution of 0.25 M concentration was spin coated on short samples of Ni-3 at%W (Ni-W) substrates and heat-treated at 1100 °C in a gas mixture of Ar-4%H2 for 15 min. Detailed x-ray studies indicate that CeO2 films have good out-of-plane and in-plane textures with full-width-half-maximum values of 5.8° and 7.5°, respectively. High temperature in situ XRD studies show that the nucleation of CeO2 films starts at 600 °C and the growth completes within 5 min when heated at 1100 °C. SEM and AFM investigations of CeO2 films reveal a fairly dense microstructure without cracks and porosity. Highly textured YSZ barrier layers and CeO2 cap layers were deposited on MOD CeO2-buffered Ni-W substrates using rf-magnetron sputtering. Pulsed laser deposition (PLD) was used to grow YBCO films on these substrates. A critical current, Jc, of about 1.5 MA cm-2 at 77 K and self-field was obtained on YBCO (PLD)/CeO2 (sputtered)/YSZ (sputtered)/CeO2 (spin-coated)/Ni-W.

  6. Comparison study of photoluminescence from InGaN/GaN multiple quantum wells and InGaN epitaxial layers under large hydrostatic pressure

    SciTech Connect

    Shan, W.; Perlin, P.; Ager, J.W. III; Walukiewicz, W.; Haller, E.E.; McCluskey, M.D.; Johnson, N.M.; Bour, D.P.

    1998-09-01

    We report the results of a comparison study of photoluminescence (PL) from an In{sub 0.15}Ga{sub 0.85}N/GaN multiple-quantum-well (MQW) sample and an In{sub 0.11}Ga{sub 0.89}N thick epitaxial-layer sample, which have very similar band-gap energies. Large hydrostatic pressures were used for our investigations. The PL emissions in both samples were found to shift linearly to higher energy with applied pressure. In the MQW sample, the pressure response of the InGaN is dominated by the GaN layers, which leads to a significantly weaker pressure dependence as compared to the epilayer sample. Our results yield a pressure coefficient of 2.8{times}10{sup {minus}3}thinspeV/kbar for the In{sub 0.15}Ga{sub 0.85}N/GaN MQW sample and 4.0{times}10{sup {minus}3}thinspeV/kbar for the In{sub 0.11}Ga{sub 0.89}N epilayer. An abrupt decrease of PL intensity in both samples was observed at pressures above 100 kbar, indicating the carriers involved in the radiative recombination processes in the samples originate primarily from the adjacent GaN layers. {copyright} {ital 1998 American Institute of Physics.}

  7. Improvements in Optical Properties of Semipolar r-Plane GaN Films Grown Using Atomically Flat ZnO Substrates and Room-Temperature Epitaxial Buffer Layers

    NASA Astrophysics Data System (ADS)

    Kobayashi, Atsushi; Kawano, Satoshi; Ueno, Kohei; Ohta, Jitsuo; Fujioka, Hiroshi

    2010-10-01

    We have investigated the structural and optical properties of semipolar r-plane GaN{1102} films grown on nearly-lattice-matched ZnO substrates with room-temperature (RT) epitaxial GaN buffer layers, putting special emphasis on the effect of surface treatment of the ZnO substrates. The full-width at half-maximum values of X-ray rocking curves for 1-µm-thick r-plane GaN layers grown at 700 °C on these RT-buffer layers, as measured using various X-ray incidence geometries, are in a range from 313 to 598 arcsec. Photoluminescence peaks attributable to structural defects in the r-plane GaN films have been shown to be reduced, and the near-band-edge emission has been enhanced by approximately 5 times by the use of atomically-flat r-plane ZnO substrates prepared by high-temperature annealing in air inside a box made of ZnO.

  8. Effect of the growth temperature and the AlN mole fraction on In incorporation and properties of quaternary III-nitride layers grown by molecular beam epitaxy

    SciTech Connect

    Fernandez-Garrido, S.; Pereiro, J.; Munoz, E.; Calleja, E.; Gago, R.; Bertram, F.; Christen, J.; Luna, E.; Trampert, A.

    2008-10-15

    Indium incorporation into wurtzite (0001)-oriented In{sub x}Al{sub y}Ga{sub 1-x-y}N layers grown by plasma-assisted molecular beam epitaxy was studied as a function of the growth temperature (565-635 deg. C) and the AlN mole fraction (0.01layer stoichiometry was determined by Rutherford backscattering spectrometry (RBS). RBS shows that indium incorporation decreased continuously with increasing growth temperature due to thermally enhanced dissociation of In-N bonds and for increasing AlN mole fractions. High resolution x-ray diffraction and transmission electron microscopy (TEM) measurements did not show evidence of phase separation. The mosaicity of the quaternary layers was found to be mainly determined by the growth temperature and independent on alloy composition within the range studied. However, depending on the AlN mole fraction, nanometer-sized composition fluctuations were detected by TEM. Photoluminescence spectra showed a single broad emission at room temperature, with energy and bandwidth S- and W-shaped temperature dependences typical of exciton localization by alloy inhomogeneities. Cathodoluminescence measurements demonstrated that the alloy inhomogeneities, responsible of exciton localization, occur on a lateral length scale below 150 nm, which is corroborated by TEM.

  9. Effect of the annealing process on the microstructure of La 2Zr 2O 7 thin layers epitaxially grown on LaAlO 3 by metalorganic decomposition

    NASA Astrophysics Data System (ADS)

    Jiménez, C.; Caroff, T.; Rapenne, L.; Morlens, S.; Santos, E.; Odier, P.; Weiss, F.

    2009-05-01

    La 2Zr 2O 7 (LZO) films have been grown by metalorganic decomposition (MOD) to be used as buffer layers for coated conductors. A characteristic feature of LZO thin films deposited by MOD is the formation of nanovoids in an almost single crystal structure of LZO pyrochlore phase. Annealing parameters (heating ramp, temperature, pressure, etc.) were varied to establish their influence on the microstructure of the LZO layers. X-ray diffraction (XRD) and transmission electron microscopy (TEM) were used for sample characterization. The epitaxial pyrochlore phase was obtained for annealing temperatures higher than 850 °C whatever the other annealing conditions. However, the film microstructure, in particular, nanovoids shape and size, is strongly dependent on heating ramp and pressure during annealing. When using low heating ramp, percolation of voids creates diffusion channels for oxygen which are detrimental for the substrate protection during coated conductor fabrication. From this point of view high heating rates are more adapted to the growth of LZO layers.

  10. Bond-length variation in InxGa1-xAs/InP strained epitaxial layers

    NASA Astrophysics Data System (ADS)

    Romanato, F.; de Salvador, D.; Berti, M.; Drigo, A.; Natali, M.; Tormen, M.; Rossetto, G.; Pascarelli, S.; Boscherini, F.; Lamberti, C.; Mobilio, S.

    1998-06-01

    Tensile and compressive InxGa1-xAs epilayers grown on [001] InP substrates have been analyzed by fluorescence-detected x-ray-absorption fine structure in order to investigate the length variation suffered by Ga-As and In-As atomic bonds under epitaxial strain. A morphological and structural analysis had previously been performed in order to select only pseudomorphic samples with high lattice quality. A clear variation of the nearest-neighbor distances proportional to the tetragonal distortion of the film has been detected. We discuss the relationship between the long- and short-range descriptions of strain accommodation in the framework of an analytical model.

  11. Surface Properties of SiC Layer Grown by Molecular Beam Epitaxy (MBE) with Helicon Sputtering Molecular Beam Source

    NASA Astrophysics Data System (ADS)

    Kakuta, Akira; Moronuki, Nobuyuki; Furukawa, Yuji

    Although there have been some attempts to produce a monocrystalline silicon carbide (SiC) flat surface, the surface properties, such as surface roughness, have not satisfied the required specifications. In this study, we apply a helicon sputtering device to molecular beam epitaxy (MBE) to improve those properties. The helicon sputtering device was used as a molecular beam source for generating a Si molecular beam, where the electric field caused by the helicon coil supplied energy to the sputtered Si molecules. The amount of energy was controlled by the electric power applied to the coil. High-purity acetylene gas was used as the carbon (C) molecular beam source. The substrate was a monocrystalline (111) Si wafer. With the increase of the electric power, that is, the supply of high energy to molecules, the roughness of the surface was improved. A uniform mirror surface of monocrystalline SiC was produced over the entire substrate with a roughness of 1nm (Ra) order.

  12. Domain matched epitaxial growth of (111) Ba{sub 0.5}Sr{sub 0.5}TiO{sub 3} thin films on (0001) Al{sub 2}O{sub 3} with ZnO buffer layer

    SciTech Connect

    Krishnaprasad, P. S. E-mail: mkj@cusat.ac.in; Jayaraj, M. K. E-mail: mkj@cusat.ac.in; Antony, Aldrin; Rojas, Fredy

    2015-03-28

    Epitaxial (111) Ba{sub 0.5}Sr{sub 0.5}TiO{sub 3} (BST) thin films have been grown by pulsed laser deposition on (0001) Al{sub 2}O{sub 3} substrate with ZnO as buffer layer. The x-ray ω-2θ, Φ-scan and reciprocal space mapping indicate epitaxial nature of BST thin films. The domain matched epitaxial growth of BST thin films over ZnO buffer layer was confirmed using Fourier filtered high resolution transmission electron microscope images of the film-buffer interface. The incorporation of ZnO buffer layer effectively suppressed the lattice mismatch and promoted domain matched epitaxial growth of BST thin films. Coplanar inter digital capacitors fabricated on epitaxial (111) BST thin films show significantly improved tunable performance over polycrystalline thin films.

  13. Growth and photocurrent characteristics of the photoconductive MnAl2S4 layers grown by hot-wall epitaxy method

    NASA Astrophysics Data System (ADS)

    You, S. H.; Hong, K. J.; Jeong, T. S.; Lim, K. Y.; Youn, C. J.

    2014-10-01

    The epitaxial growth of the photoconductive MnAl2S4 with a layered-type rhombohedral structure was first achieved by means of the hot-wall epitaxy method. From the Hall effect measurement, two dominant scattering mechanisms on the mobility were extracted. One was an acoustic phonon scattering caused by lattice vibrations at the high-temperature range of T>100 K and the other one was an impurity ion scattering at the low-temperature range of T<100 K. Also, from the relation between the reciprocal temperature and the carrier concentration, two activation energies were evaluated to be the deep level of 83.1 and a shallow level of 14.1 meV at high-temperature and middle-temperature ranges, respectively. From the photocurrent (PC) measurement, the A, B, and C peaks were observed at whole temperature range. The electronic origin of these three peaks were caused by the band-to-band transitions from the valence band states of Γ4(z), Γ5(x), and Γ5(y) to the conduction band state of Γ1(s), respectively. Thus, the parameters of the crystal-field and the spin-orbit splitting were directly extracted by means of PC spectroscopy, and those values were 3.5 and 39.9 meV, respectively. The band gap energies estimated from PC and absorption measurements were well expressed by Eg(T)=Eg(0)-2.80×10-4T2/(T+287), where Eg(0) were found to be 3.7920, 3.7955, and 3.8354 eV at the valence band states of Γ4(z), Γ5(x), and Γ5(y), respectively.

  14. Extremely low nonalloyed and alloyed contact resistance using an InAs cap layer on InGaAs by molecular-beam epitaxy

    NASA Technical Reports Server (NTRS)

    Peng, C. K.; Chen, J.; Chyi, J.; Morkoc, H.

    1988-01-01

    Extremely low alloyed and nonalloyed ohmic contact resistances have been formed on n-type InAs/In(0.53)Ga(0.47)As/In(0.52)Al(0.48)As structures grown on InP(Fe) by molecular-beam epitaxy. To insure the accuracy of the small contact resistances measured, an extended transmission line model was used to extrapolate contact resistances from test patterns with multiple gap spacings varying from 1 to 20 microns. For a 150-A-thick InAs layer doped to 2 x 10 to the 18th/cu cm and a 0.1-micron-thick InGaAs layer doped to 1 x 10 to the 18th/cu cm, a specific contact resistance of 2.6 x 10 to the -8th ohm-asterisk sq cm was measured for the nonalloyed contact, while a resistance less than 1.7 x 10 to the -8th ohm-asterisk sq cm is reported for the alloyed contact. Conventional Au-Ge/Ni/Au was used for the ohmic metal contact and alloying was performed at 500 C for 50 s in flowing H2. Using a thermionic field emission model, the barrier height at the InAs/InGaAs interface was calculated to be 20 meV.

  15. High In-content InGaN layers synthesized by plasma-assisted molecular-beam epitaxy: Growth conditions, strain relaxation, and In incorporation kinetics

    SciTech Connect

    Valdueza-Felip, S. Bellet-Amalric, E.; Pouget, S.; Monroy, E.; Wang, Y.; Chauvat, M.-P.; Ruterana, P.; Lorenz, K.; Alves, E.

    2014-12-21

    We report the interplay between In incorporation and strain relaxation kinetics in high-In-content In{sub x}Ga{sub 1-x}N (x = 0.3) layers grown by plasma-assisted molecular-beam epitaxy. For In mole fractions x = 0.13–0.48, best structural and morphological qualities are obtained under In excess conditions, at In accumulation limit, and at a growth temperature where InGaN decomposition is active. Under such conditions, in situ and ex situ analyses of the evolution of the crystalline structure with the layer thickness point to an onset of misfit relaxation after the growth of 40 nm, and a gradual relaxation during more than 200 nm, which results in an inhomogeneous strain distribution along the growth axis. This process is associated with a compositional pulling effect, i.e., indium incorporation is partially inhibited in presence of compressive strain, resulting in a compositional gradient with increasing In mole fraction towards the surface.

  16. Analysis of the substrate influence on the ordering of epitaxial molecular layers: The special case of point-on-line coincidence

    NASA Astrophysics Data System (ADS)

    Mannsfeld, S. C.; Fritz, T.

    2004-02-01

    The physical structure of organic-inorganic heteroepitaxial thin films is usually governed by a fine balance between weak molecule-molecule interactions and a weakly laterally varying molecule-substrate interaction potential. Therefore, in order to investigate the energetics of such a layer system one has to consider large molecular domains. So far, layer potential calculations for large domains of organic thin films on crystalline substrates were difficult to perform concerning the computational effort which stems from the vast number of atoms which have to be included. Here, we present a technique which enables the calculation of the molecule-substrate interaction potential for large molecular domains by utilizing potential energy grid files. This technique allows the investigation of the substrate influence in systems prepared by organic molecular beam epitaxy (OMBE), like 3,4,9,10-perylenetetracarboxylicdianhydride on highly oriented pyrolytic graphite. For this system the so-called point-on-line coincidence was proposed, a growth mode which has been controversially discussed in literature. Furthermore, we are able to provide evidence for a general energetic advantage of such point-on-line coincident domain orientations over arbitrarily oriented domains which substantiates that energetically favorable lattice structures in OMBE systems are not restricted to commensurate unit cells or coincident super cells.

  17. Effects of high-flux low-energy ion bombardment on the low-temperature growth morphology of TiN(001) epitaxial layers

    SciTech Connect

    Karr, Brian W.; Cahill, David G.; Petrov, I.; Greene, J. E.

    2000-06-15

    Ultrahigh vacuum scanning tunneling microscopy (STM) is used to characterize the surface morphology of TiN(001) epitaxial layers grown by dc reactive magnetron sputtering at growth temperatures of T{sub s}=650 and T{sub s}=750 degree sign C. An auxiliary anode is used to bias the N{sub 2} plasma and produce a large flux of low-energy N{sub 2}{sup +} ions that bombard the film surface during growth: the ratio of the N{sub 2}{sup +} flux to the Ti growth flux is {approx_equal}25. At ion energies E{sub i} near the threshold for the production of bulk defects (E{sub i}=43 eV and T{sub s}=650 degree sign C), ion bombardment decreases the amplitude of the roughness, decreases the average distance between growth mounds, and reduces the sharpness of grooves between growth mounds. The critical island radius for second layer nucleation R{sub c} is approximately 12 and 17 nm at growth temperatures of 650 and 750 degree sign C respectively; at 650 degree sign C, R{sub c} is reduced to (approx =)10 nm by ion bombardment. (c) 2000 The American Physical Society.

  18. Epitaxial Silicon Doped With Antimony

    NASA Technical Reports Server (NTRS)

    Huffman, James E.; Halleck, Bradley L.

    1996-01-01

    High-purity epitaxial silicon doped with antimony made by chemical vapor deposition, using antimony pentachloride (SbCI5) as source of dopant and SiH4, SiCI2H2, or another conventional source of silicon. High purity achieved in layers of arbitrary thickness. Epitaxial silicon doped with antimony needed to fabricate impurity-band-conduction photodetectors operating at wavelengths from 2.5 to 40 micrometers.

  19. Composition and luminescence of AlInGaN layers grown by plasma-assisted molecular beam epitaxy

    SciTech Connect

    Bejtka, K.; Edwards, P. R.; Martin, R. W.; Fernandez-Garrido, S.; Calleja, E.

    2008-10-01

    A study of AlInGaN epilayers, grown by plasma-assisted molecular beam epitaxy, was performed using spatially resolved x-ray microanalysis and luminescence spectroscopy in order to investigate competition between the incorporation of In, Al, and Ga as a function of the growth temperature in the 565-660 deg. C range and the nominal AlN mole fraction. The samples studied have AlN and InN mole fractions in the ranges of 4%-30% and 0%-16%, respectively. Composition measurements show the effect of decreasing temperature to be an increase in the incorporation of InN, accompanied by a small but discernible decrease in the ratio of GaN to AlN mole fractions. The incorporation of In is also shown to be significantly increased by decreasing the Al mole fraction. Optical emission peaks, observed by cathodoluminescence mapping and by photoluminescence, provide further information on the epilayer compositions as a function of substrate temperature, and the dependencies of peak energy and linewidth are plotted.

  20. Metallization of Epitaxial VO2 Films by Ionic Liquid Gating through Initially Insulating TiO2 Layers.

    PubMed

    Passarello, Donata; Altendorf, Simone G; Jeong, Jaewoo; Samant, Mahesh G; Parkin, Stuart S P

    2016-09-14

    Ionic liquid gating has been shown to metallize initially insulating layers formed from several different oxide materials. Of these vanadium dioxide (VO2) is of especial interest because it itself is metallic at temperatures above its metal-insulator transition. Recent studies have shown that the mechanism of ionic liquid gated induced metallization is entirely distinct from that of the thermally driven metal-insulator transition and is derived from oxygen migration through volume channels along the (001) direction of the rutile structure of VO2. Here we show that it is possible to metallize the entire volume of 10 nm thick layers of VO2 buried under layers of rutile titanium dioxide (TiO2) up to 10 nm thick. Key to this process is the alignment of volume channels in the respective oxide layers, which have the same rutile structure with clamped in-plane lattice constants. The metallization of the VO2 layers is accompanied by large structural expansions of up to ∼6.5% in the out-of-plane direction, but the structure of the TiO2 layer is hardly affected by gating. The TiO2 layers become weakly conducting during the gating process, but in contrast to the VO2 layers, the conductivity disappears on exposure to air. Indeed, even after air exposure, X-ray photoelectron spectroscopy studies show that the VO2 films have a reduced oxygen content after metallization. Ionic liquid gating of the VO2 films through initially insulating TiO2 layers is not consistent with conventional models that have assumed the gate induced carriers are of electrostatic origin. PMID:27479461

  1. Epitaxial silicon growth for solar cells

    NASA Technical Reports Server (NTRS)

    Daiello, R. V.; Robinson, P. H.; Richman, D.

    1979-01-01

    The epitaxial procedures, solar cell fabrication, and evaluation techniques are described. The development of baseline epitaxial solar cell structures grown on high quality conventional silicon substrates is discussed. Diagnostic layers and solar cells grown on four potentially low cost silicon substrates are considered. The crystallographic properties of such layers and the performance of epitaxially grown solar cells fabricated on these materials are described. An advanced epitaxial reactor, the rotary disc, is described along with the results of growing solar cell structures of the baseline type on low cost substrates. The add on cost for the epitaxial process is assessed and the economic advantages of the epitaxial process as they relate to silicon substrate selection are examined.

  2. Epitaxial growth of ultrathin MgO layers on Fe3O4(0 0 1) films

    NASA Astrophysics Data System (ADS)

    Nordmann, T.; Kuschel, O.; Wollschläger, J.

    2016-09-01

    The initial growth stages of MgO on Fe3O4 films are studied by means of X-ray photoelectron spectroscopy and low energy electron diffraction to clarify stoichiometric and structural properties of these layered structures. This bilayer structure is important to fabricate high quality magnetic tunnel junctions based on Fe3O4 electrodes and MgO tunneling barriers. For this purpose, the deposition temperature of MgO has been varied between 100 °C and 250 °C. Initially, MgO grows layer-by-layer on Fe3O4/MgO(0 0 1) forming a wetting layer. Depending on the growth temperature, after growth of a 2-3 nm thick laminar wetting layer, the MgO films finally start to roughen during growth. Thus the growth of MgO on Fe3O4/MgO(0 0 1) is described by a Stranski-Krastanov growth mode. Diffraction experiments show that the magnetite (√{ 2} ×√{ 2})R45° superstructure is removed already during the initial stages of MgO deposition. Furthermore, these experiments show that MgO films are rougher for growth at low deposition temperatures.

  3. Degenerate electrical conductive and excitonic photoluminescence properties of epitaxial films of wide gap p-type layered oxychalcogenides, LnCuOCh (Ln=La, Pr and Nd; Ch=S or Se)

    NASA Astrophysics Data System (ADS)

    Hiramatsu, H.; Ueda, K.; Takafuji, K.; Ohta, H.; Hirano, M.; Kamiya, T.; Hosono, H.

    Electrical and photoluminescence properties were investigated for epitaxial films of layered oxychalcogenides, LnCuOCh (Ln=La, Pr, and Nd, Ch=S or Se). Epitaxial films of Mg 10 at.% doped LaCuOS1-xSex are the first demonstration of degenerate conduction with high hole concentration >1020 cm-3 in wide gap p-type semiconductors. Ion substitution varied the excitonic emission energy from 3.21 eV to 2.89 eV while lanthanide and chalcogenide ion substitutions displayed the opposite tendency against cell volume. These unique properties are discussed with respect to the electronic structure originating from the layered crystal structure.

  4. GaInN light-emitting diodes using separate epitaxial growth for the p-type region to attain polarization-inverted electron-blocking layer, reduced electron leakage, and improved hole injection

    SciTech Connect

    Meyaard, David S. Lin, Guan-Bo; Ma, Ming; Fred Schubert, E.; Cho, Jaehee; Han, Sang-Heon; Kim, Min-Ho; Shim, HyunWook; Sun Kim, Young

    2013-11-11

    A GaInN light-emitting diode (LED) structure is analyzed that employs a separate epitaxial growth for the p-type region, i.e., the AlGaN electron-blocking layer (EBL) and p-type GaN cladding layer, followed by wafer or chip bonding. Such LED structure has a polarization-inverted EBL and allows for uncompromised epitaxial-growth optimization of the p-type region, i.e., without the need to consider degradation of the quantum-well active region during p-type region growth. Simulations show that such an LED structure reduces electron leakage, reduces the efficiency droop, improves hole injection, and has the potential to extend high efficiencies into the green spectral region.

  5. Spectral behavior of the temperature-dependent photoresponse of BaAl2S4 layers grown by using hot-wall epitaxy

    NASA Astrophysics Data System (ADS)

    Jeong, J. W.; Hong, K. J.; Jeong, T. S.; Youn, C. J.

    2016-08-01

    The characteristic photocurrent (PC) property of BaAl2S4 layers grown by using hot-wall epitaxy was investigated. With decreasing temperature, the PC peaks position shifted toward the short-wavelength region and its intensity decreased dramatically. The energy variation of the PC peaks shift at different temperatures could be matched well by using E g ( T) = E g (0) - 7.556 × 10-4 T 2/( T + 523), where E g (0) was 4.0596, 4.1053, and 4.1094 eV corresponding to Γ4( z), Γ5( y), and Γ5( x) in the valence band in order of increasing energy, respectively. Thus, by the selection rule, the crystal field and the spin-orbit splitting were found to be 47.5 and -5.9 meV, respectively, through PC spectroscopy measurement. From the negative result for the spin-orbit parameter, the middle Γ5( x) and the lowest Γ5( y) levels in the valence band were found to be interchanged. By using the relation between the logarithm of the PC density and the reciprocal temperature, we extracted the dominant trap level as 23.2 in the high-temperature region and 5.4 meV in the low-temperature region. Consequently, we found that the dramatic decrease on the PC intensity was caused by these trapping centers.

  6. Ultra-broadband terahertz time-domain ellipsometric spectroscopy utilizing GaP and GaSe emitters and an epitaxial layer transferred photoconductive detector

    SciTech Connect

    Yamashita, Masatsugu Takahashi, Hideki; Otani, Chiko; Ouchi, Toshihiko

    2014-02-03

    We present a reflection-type ultra-broadband terahertz (THz) time-domain spectroscopic ellipsometry system covering the frequency range of 0.5–30 THz. GaP (110) and z-cut GaSe crystals are used as emitters to generate the THz and mid-infrared pulses, respectively, and a photoconductive antenna switch using a low-temperature grown GaAs epitaxial layer transferred on Si substrate was used as a detector. By changing the emitter between the GaP and GaSe crystals, the measurable frequency range can be easily switched from the 0.5–7.8 THz range to the 7.8–30 THz range without additional optical alignment. We demonstrated the measurement of the dielectric function in a p-type InAs wafer and the optical conductivity of an indium tin oxide (ITO) thin film. The obtained carrier density and the mobility of the ITO thin film show good agreement with that obtained by the Hall measurement.

  7. Raman scattering studies of strain effects in (100) and (311)B GaAs{sub 1−x}Bi{sub x} epitaxial layers

    SciTech Connect

    Steele, J. A. Lewis, R. A.; Henini, M.; Lemine, O. M.; Alkaoud, A.

    2013-11-21

    We report room-temperature Raman studies of strained (100) and (311)B GaAs{sub 1−x}Bi{sub x} epitaxial layers for x ≤ 0.039. The Raman spectra exhibit a two-mode behavior, as well as disorder-activated GaAs-like phonons. The experimental results show that the GaAs-like LO(Γ) mode experiences a strong composition-dependent redshift as a result of alloying. The peak frequency decreases linearly from the value for pure GaAs (∼293 cm{sup −1}) with the alloyed Bi fraction x and the introduced in-plane lattice strain ε{sub ∥}, by Δω{sub LO}=Δω{sub alloy}−Δω{sub strain}. X-ray diffraction measurements are used to determine x and ε{sub ∥} allowing Δω{sub alloy} to be decoupled and is estimated to be −12(±4) cm{sup −1}/x for (100) GaAs{sub 1−x}Bi{sub x}. Δω{sub LO} is measured to be roughly double for samples grown on (311)B-oriented substrates to that of (100) GaAs. This large difference in redshift is accounted for by examining the Bi induced strain, effects from alloying, and defects formed during high-index (311)B crystal growth.

  8. On the role of secondary extinction in the measurement of the integrated intensity of X-ray diffraction peaks and in the determination of the thickness of damaged epitaxial layers

    NASA Astrophysics Data System (ADS)

    Kyutt, R. N.

    2016-06-01

    The integrated intensity of X-ray diffraction reflections has been measured for a series of epitaxial layers of AIII nitrides (GaN, AlN, AlGaN) grown on different substrates (sapphire, SiC) and characterized by different degrees of structural perfection. It has been shown that, despite a high density of dislocations and a significant broadening of the diffraction peaks, the obtained values are not described by the kinematic theory of X-ray diffraction and suggest the existence of extinction. The results have been analyzed on the basis of the Darwin and Zachariasen extinction models. The secondary extinction coefficients and the thicknesses of epitaxial layers have been determined using two orders of reflection both in the Bragg geometry (0002 and 0004) and in the Laue geometry (10bar 10) and 10bar 20). It has been demonstrated that the secondary extinction coefficient is the greater, the smaller is the broadening of the diffraction peaks and, consequently, the dislocation density. It has been found that, for epitaxial layers with a regular system of threading dislocations, the secondary extinction coefficient for the Laue reflections is substantially greater than that for the Bragg reflections.

  9. Metal-support interactions during the adsorption of CO on thin layers and islands of epitaxial palladium

    NASA Technical Reports Server (NTRS)

    Park, C.; Poppa, H.; Soria, F.

    1984-01-01

    Islands and continuous layers of palladium were grown in an ultrahigh vacuum on substrates of Mo(110)c(14 x 7)-O, designated MoO(x), and of clean Mo(110). It was found that as-deposited islands and layers exhibited bulk palladium adsorption properties for CO when deposited at room temperature and for palladium thicknesses in excess of about 3 monolayers. CO adsorption was drastically reduced, however, on annealing. For islands, annealing temperatures of as low as 400 K led to some reduction in CO adsorption whereas more severe reductions were found to occur at 600 K for islands and at 800 K for continuous multilayers. The deactivation depended on the palladium thickness, the substrate species and the extent of thermal treatments. Auger electron spectroscopy, temperature-programmed desorption and Delta-Phi measurements were combined to interpret the deactivation behavior in terms of substrate-support interactions involving the diffusion of substrate species towards the palladium surface.

  10. A nitrilo-tri-acetic-acid/acetic acid route for the deposition of epitaxial cerium oxide films as high temperature superconductor buffer layers

    SciTech Connect

    Thuy, T.T.; Lommens, P.; Narayanan, V.; Van de Velde, N.; De Buysser, K.; Herman, G.G.; Cloet, V.; Van Driessche, I.

    2010-09-15

    A water based cerium oxide precursor solution using nitrilo-tri-acetic-acid (NTA) and acetic acid as complexing agents is described in detail. This precursor solution is used for the deposition of epitaxial CeO{sub 2} layers on Ni-5at%W substrates by dip-coating. The influence of the complexation behavior on the formation of transparent, homogeneous solutions and gels has been studied. It is found that ethylenediamine plays an important role in the gelification. The growth conditions for cerium oxide films were Ar-5% gas processing atmosphere, a solution concentration level of 0.25 M, a dwell time of 60 min at 900 {sup o}C and 5-30 min at 1050 {sup o}C. X-ray diffraction (XRD), scanning electron microscope (SEM), atomic force microscopy (AFM), pole figures and spectroscopic ellipsometry were used to characterize the CeO{sub 2} films with different thicknesses. Attenuated total reflection-Fourier transform infrared (ATR-FTIR) was used to determine the carbon residue level in the surface of the cerium oxide film, which was found to be lower than 0.01%. Textured films with a thickness of 50 nm were obtained. - Graphical abstract: Study of the complexation and hydrolysis behavior of Ce{sup 4+} ions in the presence of nitrilo-tri-acetic acid and the subsequent development of an aqueous chemical solution deposition route suited for the processing of textured CeO{sub 2} buffer layers on Ni-W tapes.

  11. Beam test results of a monolithic pixel sensor in the 0.18 μm tower-jazz technology with high resistivity epitaxial layer

    NASA Astrophysics Data System (ADS)

    Mattiazzo, S.; Aimo, I.; Baudot, J.; Bedda, C.; La Rocca, P.; Perez, A.; Riggi, F.; Spiriti, E.

    2015-10-01

    The ALICE experiment at CERN will undergo a major upgrade in the second Long LHC Shutdown in the years 2018-2019; this upgrade includes the full replacement of the Inner Tracking System (ITS), deploying seven layers of Monolithic Active Pixel Sensors (MAPS). For the development of the new ALICE ITS, the Tower-Jazz 0.18 μm CMOS imaging sensor process has been chosen as it is possible to use full CMOS in the pixel and different silicon wafers (including high resistivity epitaxial layers). A large test campaign has been carried out on several small prototype chips, designed to optimize the pixel sensor layout and the front-end electronics. Results match the target requirements both in terms of performance and of radiation hardness. Following this development, the first full scale chips have been designed, submitted and are currently under test, with promising results. A telescope composed of 4 planes of Mimosa-28 and 2 planes of Mimosa-18 chips is under development at the DAFNE Beam Test Facility (BTF) at the INFN Laboratori Nazionali di Frascati (LNF) in Italy with the final goal to perform a comparative test of the full scale prototypes. The telescope has been recently used to test a Mimosa-22THRb chip (a monolithic pixel sensor built in the 0.18 μm Tower-Jazz process) and we foresee to perform tests on the full scale chips for the ALICE ITS upgrade at the beginning of 2015. In this contribution we will describe some first measurements of spatial resolution, fake hit rate and detection efficiency of the Mimosa-22THRb chip obtained at the BTF facility in June 2014 with an electron beam of 500 MeV.

  12. Reel-to-reel deposition of epitaxial double-sided MgO buffer layers for coated conductors

    NASA Astrophysics Data System (ADS)

    Xue, Yan; Xiong, Jie; Zhang, Yahui; Zhang, Fei; Zhao, Rui-Peng; Hui, Wang; Wang, Quiling; Cheng, Guo; Zhao, Xiao-Hui; Tao, Bo-Wan

    2016-06-01

    We have successfully employed a double-sided process to deposit MgO buffer layers on both sides of amorphous Y2O3 surface for double-sided YBa2Cu3O7-δ (YBCO) coated conductors (CCs) for the first time, the structure of which is of great prospect to improve the performance and cut the production cost. The biaxial textures of MgO buffer layer are noticeably affected by the ion energy and film thickness, which is demonstrated by X-ray diffraction. The best biaxial texture of double-sided MgO films shows ω-scan of (002) MgO and Φ-scan of (220) MgO yield full width at half maximum values of 4° and 7.8° for one side, respectively, as well as 3.5° and 6.7° for the other side. The subsequent double-sided YBCO films are deposited on the as-prepared MgO template with entire critical current of over 300 A/cm for both sides.

  13. Epitaxial magnetic oxide heterostructures

    NASA Astrophysics Data System (ADS)

    Belenky, Land J.

    Perovskite oxides exhibit a range of physical properties including insulator, semiconductor, metal, superconductor, ferromagnet and many more. Interactions between order parameters result in new properties such as the multiferroic materials. The production of artificial layered epitaxial magnetic heterostructures motivates this research. This requires atomic layer controlled growth which depends on selection of materials for their structural and chemical compatibility, preparation of substrates to achieve well-defined surfaces at the atomic level and the development of a deposition and analysis technique capable of controlling growth' at this level. We have used a pulsed laser deposition system with in situ reflection high-energy electron diffraction to produce epitaxial magnetic oxide heterostructures on lattice-matched substrates and have investigated a number of magnetic interactions. We have demonstrated an unusual antiferromagnetic interfacial exchange coupling between epitaxial bilayers of La0.67Sr0.33MnO 3 and SrRuO3 grown on (001) SrTiO3 substrates. The sign and magnitude of the exchange field depends on the cooling field. By interrupting the charge transfer at the interface with a very thin insulating layer, we have demonstrated this exchange biasing effect is related to the spin-dependent band structures of the materials. We have investigated the structural and magnetic properties of epitaxial multilayers and superlattices of manganites. These materials exhibit colossal magnetoresistance and the Curie temperature can be adjusted over a range of 100 K. We have fabricated La0.67Sr0.33MnO3/La 0.82Ba0.18MnO3 superlattices with layers as thin as 8 unit cells (32A). These superlattices have magnetic transition temperatures above 350 K and coercivities of approximately 10 Oe. Deposition techniques can effectively control the out-of-plane dimension on the nanoscale but control or lateral dimensions has proven more challenging. We have fabricated magnetic

  14. Fabrication of current confinement aperture structure by transforming a conductive GaN:Si epitaxial layer into an insulating GaOx layer.

    PubMed

    Lin, Chia-Feng; Lee, Wen-Che; Shieh, Bing-Cheng; Chen, Danti; Wang, Dili; Han, Jung

    2014-12-24

    We report here a simple and robust process to convert embedded conductive GaN epilayers into insulating GaOx and demonstrate its efficacy in vertical current blocking and lateral current steering in a working LED device. The fabrication processes consist of laser scribing, electrochemical (EC) wet-etching, photoelectrochemical (PEC) oxidation, and thermal oxidization of a sacrificial n(+)-GaN:Si layer. The conversion of GaN is made possible through an intermediate stage of porosification where the standard n-type GaN epilayers can be laterally and selectively anodized into a nanoporous (NP) texture while keeping the rest of the layers intact. The fibrous texture of NP GaN with an average wall thickness of less than 100 nm dramatically increases the surface-to-volume ratio and facilitates a rapid oxidation process of GaN into GaOX. The GaOX aperture was formed on the n-side of the LED between the active region and the n-type GaN layer. The wavelength blueshift phenomena of electroluminescence spectra is observed in the treated aperture-emission LED structure (441.5 nm) when compared to nontreated LED structure (443.7 nm) at 0.1 mA. The observation of aperture-confined electroluminescence from an InGaN LED structure suggests that the NP GaN based oxidation will play an enabling role in the design and fabrication of III-nitride photonic devices.

  15. Charged particle detection performances of CMOS pixel sensors produced in a 0.18 μm process with a high resistivity epitaxial layer

    NASA Astrophysics Data System (ADS)

    Senyukov, S.; Baudot, J.; Besson, A.; Claus, G.; Cousin, L.; Dorokhov, A.; Dulinski, W.; Goffe, M.; Hu-Guo, C.; Winter, M.

    2013-12-01

    The apparatus of the ALICE experiment at CERN will be upgraded in 2017/18 during the second long shutdown of the LHC (LS2). A major motivation for this upgrade is to extend the physics reach for charmed and beauty particles down to low transverse momenta. This requires a substantial improvement of the spatial resolution and the data rate capability of the ALICE Inner Tracking System (ITS). To achieve this goal, the new ITS will be equipped with 50 μm thin CMOS Pixel Sensors (CPS) covering either the three innermost layers or all the 7 layers of the detector. The CPS being developed for the ITS upgrade at IPHC (Strasbourg) is derived from the MIMOSA 28 sensor realised for the STAR-PXL at RHIC in a 0.35 μm CMOS process. In order to satisfy the ITS upgrade requirements in terms of readout speed and radiation tolerance, a CMOS process with a reduced feature size and a high resistivity epitaxial layer should be exploited. In this respect, the charged particle detection performance and radiation hardness of the TowerJazz 0.18 μm CMOS process were studied with the help of the first prototype chip MIMOSA 32. The beam tests performed with negative pions of 120 GeV/c at the CERN-SPS allowed to measure a signal-to-noise ratio (SNR) for the non-irradiated chip in the range between 22 and 32 depending on the pixel design. The chip irradiated with the combined dose of 1 MRad and 1013neq /cm2 was observed to yield an SNR ranging between 11 and 23 for coolant temperatures varying from 15 °C to 30 °C. These SNR values were measured to result in particle detection efficiencies above 99.5% and 98% before and after irradiation, respectively. These satisfactory results allow to validate the TowerJazz 0.18 μm CMOS process for the ALICE ITS upgrade.

  16. Low-temperature Raman fingerprints for few-quintuple layer topological insulator Bi2Se3 films epitaxied on GaAs.

    PubMed

    Eddrief, Mahmoud; Atkinson, Paola; Etgens, Victor; Jusserand, Bernard

    2014-06-20

    Topological insulators (Bi2Se3) of single- and few-quintuple-layer (few-QLs) films were investigated by Raman spectroscopy and epitaxied on a GaAs substrate. At a measurement temperature of 80 K, we observed the emergence of additional A2u and Eu modes (Raman inactive in the bulk crystal) below 9-QLs film thicknesses, assigned to the crystal-symmetry breakdown in ultrathin films. Furthermore, the out-of-plane A1g modes changed in width, frequency, and intensity for decreasing numbers of QL, while the in-plane Eg mode split into three Raman lines, not resolved in previous room temperature experiments. The out-of-plane Raman modes showed a strong Raman resonance at 2.4 eV for around 4-QLs film thickness, and the resonant position of the same modes shifted to 2.2 eV for 18-QLs-thick film. The film thickness-dependence of the phonons frequencies cannot solely be explained within models of weak van der Waals interlayer coupling. The results are discussed in terms of stacking-induced changes in inter- and intralayer bonding and/or the presence of long-range Coulombic interlayer interactions in topological insulator Bi2Se3. This work demonstrates that Raman spectroscopy is sensitive to changes in film thickness over the critical range of 9- to 4-QLs, which coincides with the transition between a gapless topological insulator (occurring above 6-QLs) to a conventional gapped insulator (occurring below 4-QLs).

  17. Epitaxial Deposition Of Germanium Doped With Gallium

    NASA Technical Reports Server (NTRS)

    Huffman, James E.

    1994-01-01

    Epitaxial layers of germanium doped with gallium made by chemical vapor deposition. Method involves combination of techniques and materials used in chemical vapor deposition with GeH4 or GeCl4 as source of germanium and GaCl3 as source of gallium. Resulting epitaxial layers of germanium doped with gallium expected to be highly pure, with high crystalline quality. High-quality material useful in infrared sensors.

  18. Ion Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Yamada, I.

    The following sections are included: * FILM FORMATION BY ION BEAMS * Fundamental Processes in Film Formation by Low Energy Ion Beams * Comparison of ICB with Other Physical Vapor Deposition Methods * Vacuum Deposition * Sputter Deposition * Ion Plating * Ion Beam Deposition * Simultaneous Deposition and Implantation * Plasma Enhanced Deposition * Section I References * ION CLUSTER BEAM DEPOSITION AND CLUSTER BEAM FORMATION * Nucleation Process * Growth and Condensation Process * Section II References * CHARACTERISTICS OF THE CLUSTER * Velocity of Clusters * Energy of Clusters * TEM Observation of Clusters * Structural Properties * Section III References * IONIZED CLUSTER BEAM DEPOSITION SYSTEM * Section IV References * FILM DEPOSITION PROCESS BY ICB * Fundamental Process * Effects of Kinetic Energy on the Film Properties * Epitaxial phenomena * Crystallographic Structure * Physical Structure of Films * Effects of the Electric Charge on the Film Properties * Section V References * APPLICATIONS * Silicon and Silicon Alloy Films * Low Temperature Epitaxy of Silicon Films * Thermally Stable a-Si Film Growth * High Quality SiO2 Film Deposition * Epitaxial A1 Films * Electromigration Resistant A1 Film * Thermally Stable Al/Si Contact * II-VI and III-V Compound Films * Thin Multiple Layered Film * CONCLUSIONS * Acknowledgements * Section VI References

  19. Growth of ferroelectric Ba{sub 0.8}Sr{sub 0.2}TiO{sub 3} epitaxial films by ultraviolet pulsed laser irradiation of chemical solution derived precursor layers

    SciTech Connect

    Queraltó, A.; Pérez del Pino, A. Mata, M. de la; Tristany, M.; Gómez, A.; Obradors, X.; Puig, T.; Arbiol, J.

    2015-06-29

    Highly crystalline epitaxial Ba{sub 0.8}Sr{sub 0.2}TiO{sub 3} (BST) thin-films are grown on (001)-oriented LaNiO{sub 3}-buffered LaAlO{sub 3} substrates by pulsed laser irradiation of solution derived barium-zirconium-titanium precursor layers using a UV Nd:YAG laser source at atmospheric conditions. The structural analyses of the obtained films, studied by X-ray diffractometry and transmission electron microscopy, demonstrate that laser processing allows the growth of tens of nm-thick BST epitaxial films with crystalline structure similar to that of films obtained through conventional thermal annealing methods. However, the fast pulsed nature of the laser employed leads to crystallization kinetic evolution orders of magnitude faster than in thermal treatments. The combination of specific photothermal and photochemical mechanisms is the main responsible for the ultrafast epitaxial laser-induced crystallization. Piezoresponse microscopy measurements demonstrate equivalent ferroelectric behavior in laser and thermally annealed films, being the piezoelectric constant ∼25 pm V{sup −1}.

  20. Relationship between dislocation and the visible luminescence band observed in ZnO epitaxial layers grown on c-plane p-GaN templates by chemical vapor deposition technique

    NASA Astrophysics Data System (ADS)

    Saroj, Rajendra K.; Dhar, S.

    2016-08-01

    ZnO epitaxial layers are grown on c-plane GaN (p-type)/sapphire substrates using a chemical vapor deposition technique. Structural and luminescence properties of these layers have been studied systematically as a function of various growth parameters. It has been found that high quality ZnO epitaxial layers can indeed be grown on GaN films at certain optimum conditions. It has also been observed that the growth temperature and growth time have distinctly different influences on the screw and edge dislocation densities. While the growth temperature affects the density of edge dislocations more strongly than that of screw dislocations, an increase of growth duration leads to a rapid drop in the density of screw dislocation, whereas the density of edge dislocation hardly changes. Densities of both edge and screw dislocations are found to be minimum at a growth temperature of 500 °C. Interestingly, the defect related visible luminescence intensity also shows a minimum at the same temperature. Our study indeed suggests that the luminescence feature is related to threading edge dislocation. A continuum percolation model, where the defects responsible for visible luminescence are considered to be formed under the influence of the strain field surrounding the threading edge dislocations, is proposed. The theory explains the observed variation of the visible luminescence intensity as a function of the concentration of the dislocations.

  1. Effects of the high-temperature-annealed self-buffer layer on the improved properties of ZnO epilayers grown by helicon-wave-excited-plasma sputtering epitaxy on a-plane sapphire substrates

    NASA Astrophysics Data System (ADS)

    Koyama, T.; Fouda, A. N.; Shibata, N.; Chichibu, S. F.

    2007-10-01

    The use of the high-temperature-annealed self-buffer layer (HITAB) enabled to observe free A-and B-exciton emissions at 9K from ZnO heteroepitaxial films grown by the sputtering epitaxy method using a helicon-wave-excited plasma on uniaxially nearly lattice-matched (112¯0) Al2O3 substrates. The result was correlated with a twofold decrease in the densities of threading dislocations having both the screw and edge components, according to the dislocation concealing in ZnO HITAB due to lateral mass transport of low-temperature deposited ZnO nanocrystalline grains during high temperature annealing.

  2. Giant pyroelectric coefficient determined from the frequency dependence of the pyroelectric signal generated by epitaxial Pb(Zr0.2Ti0.8)O3 layers grown on single crystal SrTiO3 substrates

    NASA Astrophysics Data System (ADS)

    Botea, M.; Iuga, A.; Pintilie, L.

    2013-12-01

    Epitaxial Pb(Zr0.2Ti0.8)O3 layers of good structural quality were grown on single crystal SrTiO3 substrates. The pyroelectric coefficient was estimated from the signal generated by the ferroelectric film working as a pyroelectric detector in the voltage mode, without pre-poling procedure. The obtained value is as high as 1.9 × 10-3 C/m2 K. The large value is attributed to the presence of 90° ferroelectric domains and to the compressive misfit strain, leading to an enhanced ferroelectric polarization.

  3. m-plane GaN layers grown by rf-plasma assisted molecular beam epitaxy with varying Ga/N flux ratios on m-plane 4H-SiC substrates

    SciTech Connect

    Armitage, R.; Horita, M.; Suda, J.; Kimoto, T.

    2007-02-01

    A series of m-plane GaN layers with the Ga beam-equivalent pressure (BEP) as the only varied parameter was grown by rf-plasma assisted molecular beam epitaxy on m-plane 4H-SiC substrates using AlN buffer layers. The smoothest growth surfaces and most complete film coalescence were found for the highest Ga BEP corresponding to the Ga droplet accumulation regime. However, better structural quality as assessed by x-ray rocking curves was observed for growth at a lower Ga BEP value below the droplet limit. The variation of rocking curve widths for planes inclined with respect to the epilayer c axis followed a different trend with Ga BEP than those of reflections parallel to the c axis. The GaN layers were found to exhibit a large residual compressive strain along the a axis.

  4. Epitaxial growth of europium monoxide on diamond

    SciTech Connect

    Melville, A.; Heeg, T.; Mairoser, T.; Schmehl, A.; Fischer, M.; Gsell, S.; Schreck, M.; Awschalom, D. D.; Holländer, B.; Schubert, J.; Schlom, D. G.

    2013-11-25

    We report the epitaxial integration of phase-pure EuO on both single-crystal diamond and on epitaxial diamond films grown on silicon utilizing reactive molecular-beam epitaxy. The epitaxial orientation relationship is (001) EuO ‖ (001) diamond and [110] EuO ‖[100] diamond. The EuO layer is nominally unstrained and ferromagnetic with a transition temperature of 68 ± 2 K and a saturation magnetization of 5.5 ± 0.1 Bohr magnetons per europium ion on the single-crystal diamond, and a transition temperature of 67 ± 2 K and a saturation magnetization of 2.1 ± 0.1 Bohr magnetons per europium ion on the epitaxial diamond film.

  5. Digitally Alloyed Modulated Precursor Flow Epitaxial Growth of Ternary AlGaN with Binary AlN and GaN Sub-Layers and Observation of Compositional Inhomogeneity

    NASA Astrophysics Data System (ADS)

    Kim, Hee Jin; Choi, Suk; Yoo, Dongwon; Ryou, Jae-Hyun; Hawkridge, Michael E.; Liliental-Weber, Zuzanna; Dupuis, Russell D.

    2010-05-01

    We report the growth of ternary aluminum gallium nitride (AlGaN) layers on AlN/sapphire template/substrates by digitally alloyed modulated precursor flow epitaxial growth (DA-MPEG), which combined an MPEG AlN sub-layer with a conventional metalorganic chemical vapor deposition (MOCVD)-grown GaN sub-layer. The overall composition in DA-MPEG Al x Ga1- x N was controlled by adjustment of the growth time (i.e., the thickness) of the GaN sub-layer. As the GaN sub-layer growth time increased, the Al composition in AlGaN decreased to 50%, but the surface morphology of the AlGaN layer became rough, and a three-dimensional structure with islands appeared for the DA-MPEG AlGaN with relatively thick GaN sub-layers, possibly resulting from the Ga adatom surface migration behavior and/or the strain built up from lattice mismatch between AlN and GaN sub-layers with increasing GaN sub-layer growth time. Through strain analysis by high-resolution x-ray diffraction, reciprocal space mapping, and scanning transmission electron microscopy, it was found that there was compositional inhomogeneity in the DA-MPEG AlGaN with AlN and GaN binary sub-layers for the case of the layer with relatively thick GaN sub-layers.

  6. Growth kinetics and structural perfection of (InN)1/(GaN)1-20 short-period superlattices on +c-GaN template in dynamic atomic layer epitaxy

    NASA Astrophysics Data System (ADS)

    Kusakabe, Kazuhide; Hashimoto, Naoki; Itoi, Takaomi; Wang, Ke; Imai, Daichi; Yoshikawa, Akihiko

    2016-04-01

    The growth kinetics and structural perfection of (InN)1/(GaN)1-20 short-period superlattices (SPSs) were investigated with their application to ordered alloys in mind. The SPSs were grown on +c-GaN template at 650 °C by dynamic atomic layer epitaxy in conventional plasma-assisted molecular beam epitaxy. It was found that coherent structured InN/GaN SPSs could be fabricated when the thickness of the GaN barrier was 4 ML or above. Below 3 ML, the formation of SPSs was quite difficult owing to the increased strain in the SPS structure caused by the use of GaN as a template. The effective or average In composition of the (InN)1/(GaN)4 SPSs was around 10%, and the corresponding InN coverage in the ˜1 ML-thick InN wells was 50%. It was found that the effective InN coverage in ˜1 ML-thick InN wells could be varied with the growth conditions. In fact, the effective In composition could be increased up to 13.5%, i.e., the corresponding effective InN coverage was about 68%, by improving the capping/freezing speed by increasing the growth rate of the GaN barrier layer.

  7. Epitaxial silicon devices for dosimetry applications

    SciTech Connect

    Bruzzi, M.; Bucciolini, M.; Casati, M.; Menichelli, D.; Talamonti, C.; Piemonte, C.; Svensson, B. G.

    2007-04-23

    A straightforward improvement of the efficiency and long term stability of silicon dosimeters has been obtained with a n{sup +}-p junction surrounded by a guard-ring structure implanted on an epitaxial p-type Si layer grown on a Czochralski substrate. The sensitivity of devices made on 50-{mu}m-thick epitaxial Si degrades by only 7% after an irradiation with 6 MeV electrons up to 1.5 kGy, and shows no significant further decay up to 10 kGy. These results prove the enhanced radiation tolerance and stability of epitaxial diodes as compared to present state-of-the-art Si devices.

  8. Temperature dependence of threading dislocation density in In 0.2Ga 0.8As layers grown on GaAs substrates by metalorganic-vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Takano, Y.; Kobayashi, K.; Shirakata, S.; Umezawa, M.; Fuke, S.

    2005-08-01

    In 0.2Ga 0.8As layers were grown on GaAs substrates with graded buffer layers by metalorganic vapor phase epitaxy at 370-630 °C. Good surface morphology with a crosshatch pattern (CHP) was obtained at 600 and 630 °C. Transmission electron microscopy (TEM) observation confirmed that the cap layers had a threading dislocation density of between 1.3 and 2.0×10 6 cm -2. At 500 °C, a layer showed a rough surface morphology. Phase separation was revealed by TEM. The threading dislocation density was over 1×10 7 cm -2 at 500 °C. Good surface morphology with a CHP was obtained at 430, 450 and 480 °C. A layer grown at 430 °C showed the lowest threading dislocation density of 2.5×10 5 cm -2. Low temperature growth was effective for lowering the threading dislocation density in the cap layers.

  9. 2D SWIR image sensor with extended wavelength cutoff of 2.5 μm on InP/InGaAs epitaxial wafers with graded buffer layers

    NASA Astrophysics Data System (ADS)

    Mushini, Prabhu; Huang, Wei; Morales, Manuel; Brubaker, Robert; Nguyen, Thuc-Uyen; Dobies, Matt; Zhang, Wei; Gustus, William; Mathews, Gary; Endicter, Scott; Paik, Namwoong

    2016-05-01

    Two-dimensional photo detector arrays with a cutoff wavelength of 2.5 μm were fabricated on InP/InGaAs epitaxial wafers with graded buffer layers in a 320x256 geometry on a 12.5μm pitch. Novel growth and fabrication techniques were employed to fabricate these arrays and optimize the performance. The dark current of the detector was investigated for a wide range of temperatures. The fabricated detector array was mated with a ROIC and packaged with a multi-stage TEC and investigated further at the FPA level. The effect of the graded buffer layers on the sensor performance was investigated and the results were compared to other methods used to develop and fabricate 2D image sensors on extended wavelength materials.

  10. Incorporation of La in epitaxial SrTiO{sub 3} thin films grown by atomic layer deposition on SrTiO{sub 3}-buffered Si (001) substrates

    SciTech Connect

    McDaniel, Martin D.; Ngo, Thong Q.; Ekerdt, John G.; Posadas, Agham; Demkov, Alexander A.; Karako, Christine M.; Bruley, John; Frank, Martin M.; Narayanan, Vijay

    2014-06-14

    Strontium titanate, SrTiO{sub 3} (STO), thin films incorporated with lanthanum are grown on Si (001) substrates at a thickness range of 5–25 nm. Atomic layer deposition (ALD) is used to grow the La{sub x}Sr{sub 1−x}TiO{sub 3} (La:STO) films after buffering the Si (001) substrate with four-unit-cells of STO deposited by molecular beam epitaxy. The crystalline structure and orientation of the La:STO films are confirmed via reflection high-energy electron diffraction, X-ray diffraction, and cross-sectional transmission electron microscopy. The low temperature ALD growth (∼225 °C) and post-deposition annealing at 550 °C for 5 min maintains an abrupt interface between Si (001) and the crystalline oxide. Higher annealing temperatures (650 °C) show more complete La activation with film resistivities of ∼2.0 × 10{sup −2} Ω cm for 20-nm-thick La:STO (x ∼ 0.15); however, the STO-Si interface is slightly degraded due to the increased annealing temperature. To demonstrate the selective incorporation of lanthanum by ALD, a layered heterostructure is grown with an undoped STO layer sandwiched between two conductive La:STO layers. Based on this work, an epitaxial oxide stack centered on La:STO and BaTiO{sub 3} integrated with Si is envisioned as a material candidate for a ferroelectric field-effect transistor.

  11. Wafer-scale controlled exfoliation of metal organic vapor phase epitaxy grown InGaN/GaN multi quantum well structures using low-tack two-dimensional layered h-BN

    NASA Astrophysics Data System (ADS)

    Ayari, Taha; Sundaram, Suresh; Li, Xin; El Gmili, Youssef; Voss, Paul L.; Salvestrini, Jean Paul; Ougazzaden, Abdallah

    2016-04-01

    Recent advances in epitaxial growth have led to the growth of III-nitride devices on 2D layered h-BN. This advance has the potential for wafer-scale transfer to arbitrary substrates, which could improve the thermal management and would allow III-N devices to be used more flexibly in a broader range of applications. We report wafer scale exfoliation of a metal organic vapor phase epitaxy grown InGaN/GaN Multi Quantum Well (MQW) structure from a 5 nm thick h-BN layer that was grown on a 2-inch sapphire substrate. The weak van der Waals bonds between h-BN atomic layers break easily, allowing the MQW structure to be mechanically lifted off from the sapphire substrate using a commercial adhesive tape. This results in the surface roughness of only 1.14 nm on the separated surface. Structural characterizations performed before and after the lift-off confirm the conservation of structural properties after lift-off. Cathodoluminescence at 454 nm was present before lift-off and 458 nm was present after. Electroluminescence near 450 nm from the lifted-off structure has also been observed. These results show that the high crystalline quality ultrathin h-BN serves as an effective sacrificial layer—it maintains performance, while also reducing the GaN buffer thickness and temperature ramps as compared to a conventional two-step growth method. These results support the use of h-BN as a low-tack sacrificial underlying layer for GaN-based device structures and demonstrate the feasibility of large area lift-off and transfer to any template, which is important for industrial scale production.

  12. Domain epitaxy for thin film growth

    DOEpatents

    Narayan, Jagdish

    2005-10-18

    A method of forming an epitaxial film on a substrate includes growing an initial layer of a film on a substrate at a temperature T.sub.growth, said initial layer having a thickness h and annealing the initial layer of the film at a temperature T.sub.anneal, thereby relaxing the initial layer, wherein said thickness h of the initial layer of the film is greater than a critical thickness h.sub.c. The method further includes growing additional layers of the epitaxial film on the initial layer subsequent to annealing. In some embodiments, the method further includes growing a layer of the film that includes at least one amorphous island.

  13. Method of depositing an electrically conductive oxide buffer layer on a textured substrate and articles formed therefrom

    DOEpatents

    Paranthaman, M. Parans; Aytug, Tolga; Christen, David K.

    2005-10-18

    An article with an improved buffer layer architecture includes a substrate having a textured metal surface, and an electrically conductive lanthanum metal oxide epitaxial buffer layer on the surface of the substrate. The article can also include an epitaxial superconducting layer deposited on the epitaxial buffer layer. An epitaxial capping layer can be placed between the epitaxial buffer layer and the superconducting layer. A method for preparing an epitaxial article includes providing a substrate with a metal surface and depositing on the metal surface a lanthanum metal oxide epitaxial buffer layer. The method can further include depositing a superconducting layer on the epitaxial buffer layer, and depositing an epitaxial capping layer between the epitaxial buffer layer and the superconducting layer.

  14. Method of depositing an electrically conductive oxide buffer layer on a textured substrate and articles formed therefrom

    DOEpatents

    Paranthaman, M. Parans; Aytug, Tolga; Christen, David K.

    2003-09-09

    An article with an improved buffer layer architecture includes a substrate having a textured metal surface, and an electrically conductive lanthanum metal oxide epitaxial buffer layer on the surface of the substrate. The article can also include an epitaxial superconducting layer deposited on the epitaxial buffer layer. An epitaxial capping layer can be placed between the epitaxial buffer layer and the superconducting layer. A method for preparing an epitaxial article includes providing a substrate with a metal surface and depositing on the metal surface a lanthanum metal oxide epitaxial buffer layer. The method can further include depositing a superconducting layer on the epitaxial buffer layer, and depositing an epitaxial capping layer between the epitaxial buffer layer and the superconducting layer.

  15. Junction Transport in Epitaxial Film Silicon Heterojunction Solar Cells: Preprint

    SciTech Connect

    Young, D. L.; Li, J. V.; Teplin, C. W.; Stradins, P.; Branz, H. M.

    2011-07-01

    We report our progress toward low-temperature HWCVD epitaxial film silicon solar cells on inexpensive seed layers, with a focus on the junction transport physics exhibited by our devices. Heterojunctions of i/p hydrogenated amorphous Si (a-Si) on our n-type epitaxial crystal Si on n++ Si wafers show space-charge-region recombination, tunneling or diffusive transport depending on both epitaxial Si quality and the applied forward voltage.

  16. Superconductivity in Ca-intercalated epitaxial graphene on silicon carbide

    NASA Astrophysics Data System (ADS)

    Li, Kang; Feng, Xiao; Zhang, Wenhao; Ou, Yunbo; Chen, Lianlian; He, Ke; Wang, Li-Li; Guo, Liwei; Liu, Guodong; Xue, Qi-Kun; Ma, Xucun

    2013-08-01

    We have prepared Ca-intercalated multilayer epitaxial graphene films on silicon carbide and observed superconductivity in them with both magnetic and transport measurements. Superconducting transition has been detected at temperature up to 7 K in Ca-intercalated epitaxial graphene with the thickness down to 10 layers grown on both Si-face and C-face of silicon carbide. The result demonstrates intercalated epitaxial graphene as a good platform to study graphene-based superconductivity.

  17. Dopant in Near-Surface Semiconductor Layers of Metal-Insulator-Semiconductor Structures Based on Graded-Gap p-Hg0.78Cd0.22Te Grown by Molecular-Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Voitsekhovskii, A. V.; Nesmelov, S. N.; Dzyadukh, S. M.

    2016-02-01

    Peculiarities in determining the dopant concentration and dopant distribution profile in the near-surface layer of a semiconductor are investigated by measuring the admittance of metal-insulator-semiconductor structures (MIS structures) based on p-Hg0.78Cd0.22Te grown by molecular beam epitaxy. The dopant concentrations in the near-surface layer of the semiconductor are determined by measuring the admittance of MIS structures in the frequency range of 50 kHz to 1 MHz. It is shown that in this frequency range, the capacitance-voltage characteristics of MIS structures based on p-Hg0.78Cd0.22Te with a near-surface graded gap layer demonstrate a high-frequency behavior with respect to the recharge time of surface states located near the Fermi level for an intrinsic semiconductor. The formation time of the inversion layer is decreased by less than two times, if a near-surface graded-gap layer is created. The dopant distribution profile in the near-surface layer of the semiconductor is found, and it is shown that for structures based on p-Hg0.78Cd0.22Te with a near-surface graded-gap layer, the dopant concentration has a minimum near the interface with the insulator. For MIS structure based on n-Hg0.78Cd0.22Te, the dopant concentration is more uniformly distributed in the near-surface layer of the semiconductor.

  18. Effects of the group V/III ratio and a gan inter-layer on the crystal quality of InN grown by using the hydride vapor-phase epitaxy method

    NASA Astrophysics Data System (ADS)

    Ha, Ju-Hyung; Wang, Juan; Lee, Won-Jae; Choi, Young-Jun; Lee, Hae-Yong; Kim, Jung-Gon; Harima, Hiroshi

    2015-03-01

    The hydride vapor-phase epitaxy (HVPE) method was used to deposit high-quality InN layers on GaN inter-layer/sapphire (0001) structures that had been fabricated by using either the HVPE method or the metal-organic chemical-phase deposition (MOCVD) method. The effects of the group V/III ratio and different GaN inter-layers on the crystal quality of the InN layers were systemically investigated. The InN layer grown at a low Group V/III ratio revealed a high crystal quality with a two-dimensional (2D) growth mode. Also, the 110.7-nm-thick InN layer grown by using HVPE on a GaN inter-layer/sapphire (0001) substrate structure that had been fabricated by using MOCVD had a high crystal quality, with the full width at half maximum (FWHM) of the InN X-ray diffraction (XRD) peak being about 844 arcsec, and a smooth surface with an atomic force microscopy (AFM) roughness of about 0.07 nm. On the other hand, the 145.7-nm-thick InN layer grown by using HVPE on a GaN inter-layer/sapphire (0001) substrate structure that had been fabricated by using the HVPE method had a lower crystal quality, a FWHM value for the InN (0002) peak of about 2772 arcsec, and a surface roughness of about 3.73 nm. In addition, the peak of the E2 (high) phonon mode for the 110.7-nm-thick InN layer grown by using HVPE on a GaN inter-layer/sapphire (0001) structure that had been fabricated by using MOCVD was detected at 491 cm -1 and had a FWHM of 9.9 cm-1. As a result, InN layers grown by using HVPE on GaN inter-layer/sapphire (0001) substrate structures fabricated by using MOCVD have a high crystal quality and a reduced Raman value, which agrees well with the results of the XRD analysis.

  19. Peculiarities of Determining the Dopant Concentration in the Near-Surface Layer of a Semiconductor by Measuring the Admittance of MIS Structures Based on P-Hg0.78Cd0.22Te Grown by Molecular Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Voitsekhovskii, A. V.; Nesmelov, S. N.; Dzyadukh, S. M.

    2016-06-01

    Peculiarities of determining the concentration and distribution profile of dopant in the near-surface layer of a semiconductor by measuring the admittance of MIS structures based on p-Hg0.78Cd0.22Te grown by molecular beam epitaxy are studied. A technique is proposed for the determining the concentration of dopant based on the measurement of the admittance of MIS structures in the frequency range of 50 kHz - 1 MHz. It is shown that in this frequency range, the capacitance-voltage characteristics of MIS structures based on p-Hg0.78Cd0.22Te with a near-surface graded-gap layer have a high- frequency behavior with respect to the recharge time of surface states located near the Fermi level of intrinsic semiconductor. The distribution profile of dopant in the nearsurface layer of the semiconductor is calculated. It is shown that in p-Hg0.78Cd0.22Te with a near-surface graded-gap layer, the dopant concentration has the lowest value near the interface with the insulator.

  20. Minority-carrier diffusion length, minority-carrier lifetime, and photoresponsivity of β-FeSi2 layers grown by molecular-beam epitaxy

    NASA Astrophysics Data System (ADS)

    Akutsu, Keiichi; Kawakami, Hideki; Suzuno, Mitsushi; Yaguchi, Takashi; Jiptner, Karolin; Chen, Jun; Sekiguchi, Takashi; Ootsuka, Teruhisa; Suemasu, Takashi

    2011-06-01

    We have epitaxially grown undoped β-FeSi2 films on Si(111) substrates via atomic-hydrogen-assisted molecular-beam epitaxy. β-FeSi2 films grown without atomic hydrogen exhibited p-type conduction with a hole density of over 1019 cm-3 at room temperature (RT). In contrast, those prepared with atomic hydrogen showed n-type conduction and had a residual electron density that was more than two orders of magnitude lower than the hole density of films grown without atomic hydrogen (of the order of 1016 cm-3 at RT). The minority-carrier diffusion length was estimated to be approximately 16 μm using an electron-beam-induced current technique; this value is twice as large as that for β-FeSi2 prepared without atomic hydrogen. This result could be well explained in terms of the minority-carrier lifetimes measured by a microwave photoconductance decay technique. The 1/e decay time using a 904 nm laser pulse was approximately 17 μs, which is much longer than that for β-FeSi2 prepared without atomic hydrogen (3 μs). The photoresponsivity reached 13 mA/W at 1.31 μm, which is the highest value ever reported for β-FeSi2 films.

  1. The impact of RF-plasma power in carrier relaxation dynamics of unintentional doped GaN epitaxial layers grown by MBE

    NASA Astrophysics Data System (ADS)

    Prakash, Nisha; Anand, Kritika; Barvat, Arun; Pal, Prabir; Singh, Dilip K.; Jewariya, Mukesh; Ragam, Srinivasa; Adhikari, Sonachand; Maurya, Kamlesh K.; Khanna, Suraj P.

    2016-04-01

    In this work, unintentionally doped GaN samples were prepared on GaN template by radio frequency (RF)-plasma MBE technique using two different RF-plasma powers. Photoluminescence (PL), steady state photoconductivity (PC) and ultrafast optical pump-probe spectroscopy measurements have been carried out to characterize the samples. The effect of RF-plasma power towards unintentional doping and giving rise to yellow luminescence (YL) is discussed. Our PC measurements show relatively faster decay for sample grown with higher RF-plasma power. In addition, the ultrafast optical pump-probe spectroscopy results show the presence of various defect levels with different relaxation times. A faster ultrafast relaxation time from the conduction band to the closest defect level and conduction band to the next defect level was observed for the sample grown with higher plasma power. A comparatively low defect density and faster carrier relaxation observed in higher RF-plasma power grown samples is caused by lower impurities and gallium vacancies. The results imply that RF-plasma power is very important parameter for the growth of epitaxial GaN films and undesirable impurities and gallium vacancies might get incorporated in the epitaxial GaN films.

  2. Minority-carrier diffusion length, minority-carrier lifetime, and photoresponsivity of {beta}-FeSi{sub 2} layers grown by molecular-beam epitaxy

    SciTech Connect

    Akutsu, Keiichi; Kawakami, Hideki; Suzuno, Mitsushi; Yaguchi, Takashi; Jiptner, Karolin; Chen, Jun; Sekiguchi, Takashi; Ootsuka, Teruhisa; Suemasu, Takashi

    2011-06-15

    We have epitaxially grown undoped {beta}-FeSi{sub 2} films on Si(111) substrates via atomic-hydrogen-assisted molecular-beam epitaxy. {beta}-FeSi{sub 2} films grown without atomic hydrogen exhibited p-type conduction with a hole density of over 10{sup 19} cm{sup -3} at room temperature (RT). In contrast, those prepared with atomic hydrogen showed n-type conduction and had a residual electron density that was more than two orders of magnitude lower than the hole density of films grown without atomic hydrogen (of the order of 10{sup 16} cm{sup -3} at RT). The minority-carrier diffusion length was estimated to be approximately 16 {mu}m using an electron-beam-induced current technique; this value is twice as large as that for {beta}-FeSi{sub 2} prepared without atomic hydrogen. This result could be well explained in terms of the minority-carrier lifetimes measured by a microwave photoconductance decay technique. The 1/e decay time using a 904 nm laser pulse was approximately 17 {mu}s, which is much longer than that for {beta}-FeSi{sub 2} prepared without atomic hydrogen (3 {mu}s). The photoresponsivity reached 13 mA/W at 1.31 {mu}m, which is the highest value ever reported for {beta}-FeSi{sub 2} films.

  3. Engineering 180° ferroelectric domains in epitaxial PbTiO{sub 3} thin films by varying the thickness of the underlying (La,Sr)MnO{sub 3} layer

    SciTech Connect

    Jin, L.; Jia, C. L.; Vrejoiu, I.

    2014-09-29

    Epitaxial ferroelectric thin films of PbTiO{sub 3} (PTO) grown on top of nominally La{sub 0.7}Sr{sub 0.3}MnO{sub 3} (LSMO) submicron hillocks on Nb-doped SrTiO{sub 3} (100) substrate were investigated by means of scanning transmission electron microscopy. 180° ferroelectric domains were observed in the c-axis oriented PTO films. The formation and configuration of ferroelectric domains and domain walls were found to exhibit strong correlation with the thickness of the underlying LSMO hillocks. The domain walls start at the locations of the hillocks where the LSMO layer has a thickness of about 3 nm. Our results demonstrate that controlling the thickness variation (shape) of the LSMO hillocks can manipulate the position and density of the ferroelectric domain walls, which are considered to be the active elements for future nanoelectronics.

  4. Temperature-dependent capacitance-voltage and current-voltage characteristics of Pt/Ga2O3 (001) Schottky barrier diodes fabricated on n--Ga2O3 drift layers grown by halide vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Higashiwaki, Masataka; Konishi, Keita; Sasaki, Kohei; Goto, Ken; Nomura, Kazushiro; Thieu, Quang Tu; Togashi, Rie; Murakami, Hisashi; Kumagai, Yoshinao; Monemar, Bo; Koukitu, Akinori; Kuramata, Akito; Yamakoshi, Shigenobu

    2016-03-01

    We investigated the temperature-dependent electrical properties of Pt/Ga2O3 Schottky barrier diodes (SBDs) fabricated on n--Ga2O3 drift layers grown on single-crystal n+-Ga2O3 (001) substrates by halide vapor phase epitaxy. In an operating temperature range from 21 °C to 200 °C, the Pt/Ga2O3 (001) Schottky contact exhibited a zero-bias barrier height of 1.09-1.15 eV with a constant near-unity ideality factor. The current-voltage characteristics of the SBDs were well-modeled by thermionic emission in the forward regime and thermionic field emission in the reverse regime over the entire temperature range.

  5. Epitaxial CoSi2 on MOS devices

    DOEpatents

    Lim, Chong Wee; Shin, Chan Soo; Petrov, Ivan Georgiev; Greene, Joseph E.

    2005-01-25

    An Si.sub.x N.sub.y or SiO.sub.x N.sub.y liner is formed on a MOS device. Cobalt is then deposited and reacts to form an epitaxial CoSi.sub.2 layer underneath the liner. The CoSi.sub.2 layer may be formed through a solid phase epitaxy or reactive deposition epitaxy salicide process. In addition to high quality epitaxial CoSi.sub.2 layers, the liner formed during the invention can protect device portions during etching processes used to form device contacts. The liner can act as an etch stop layer to prevent excessive removal of the shallow trench isolation, and protect against excessive loss of the CoSi.sub.2 layer.

  6. Method of deposition by molecular beam epitaxy

    DOEpatents

    Chalmers, Scott A.; Killeen, Kevin P.; Lear, Kevin L.

    1995-01-01

    A method is described for reproducibly controlling layer thickness and varying layer composition in an MBE deposition process. In particular, the present invention includes epitaxially depositing a plurality of layers of material on a substrate with a plurality of growth cycles whereby the average of the instantaneous growth rates for each growth cycle and from one growth cycle to the next remains substantially constant as a function of time.

  7. Pure AlN layers in metal-polar AlGaN/AlN/GaN and AlN/GaN heterostructures grown by low-temperature ammonia-based molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Kaun, Stephen W.; Mazumder, Baishakhi; Fireman, Micha N.; Kyle, Erin C. H.; Mishra, Umesh K.; Speck, James S.

    2015-05-01

    When grown at a high temperature (820 °C) by ammonia-based molecular beam epitaxy (NH3-MBE), the AlN layers of metal-polar AlGaN/AlN/GaN heterostructures had a high GaN mole fraction (∼0.15), as identified by atom probe tomography in a previous study (Mazumder et al 2013 Appl. Phys. Lett. 102 111603). In the study presented here, growth at low temperature (<740 °C) by NH3-MBE yielded metal-polar AlN layers that were essentially pure at the alloy level. The improved purity of the AlN layers grown at low temperature was correlated to a dramatic increase in the sheet density of the two-dimensional electron gas (2DEG) at the AlN/GaN heterointerface. Through application of an In surfactant, metal-polar AlN(3.5 nm)/GaN and AlGaN/AlN(2.5 nm)/GaN heterostructures grown at low temperature yielded low 2DEG sheet resistances of 177 and 285 Ω/□, respectively.

  8. X-ray photoelectron spectroscopy studies of initial growth mechanism of CdTe layers grown on (100)GaAs by organometallic vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Sone, Syuji; Ekawa, Mitsuru; Yasuda, Kazuhito; Sugiura, Yoshiyuki; Saji, Manabu; Tanaka, Akikazu

    1990-02-01

    Variations of the GaAs surface conditions and the adsorption of the precursor elements of Cd and Te on the (100)GaAs substrate were studied by x-ray photoelectron spectroscopy at the initial stage of CdTe growth by organometallic vapor phase epitaxy. The stoichiometry of GaAs substrates was found to recover by annealing in the H2 environment (500 °C, 5 min), while the surface was initially in an As-rich condition after etching with H2SO4:H2O2:H2O (5:1:1). The preferential adsorption of Te on the GaAs surface was also observed. <100> oriented growth was obtained routinely when the GaAs surface was fully stabilized with Te after the H2 anneal under the above conditions. <111> oriented growth resulted when dimethylcadmium was first introduced after the anneal.

  9. Selective epitaxy using the gild process

    DOEpatents

    Weiner, Kurt H.

    1992-01-01

    The present invention comprises a method of selective epitaxy on a semiconductor substrate. The present invention provides a method of selectively forming high quality, thin GeSi layers in a silicon circuit, and a method for fabricating smaller semiconductor chips with a greater yield (more error free chips) at a lower cost. The method comprises forming an upper layer over a substrate, and depositing a reflectivity mask which is then removed over selected sections. Using a laser to melt the unmasked sections of the upper layer, the semiconductor material in the upper layer is heated and diffused into the substrate semiconductor material. By varying the amount of laser radiation, the epitaxial layer is formed to a controlled depth which may be very thin. When cooled, a single crystal epitaxial layer is formed over the patterned substrate. The present invention provides the ability to selectively grow layers of mixed semiconductors over patterned substrates such as a layer of Ge.sub.x Si.sub.1-x grown over silicon. Such a process may be used to manufacture small transistors that have a narrow base, heavy doping, and high gain. The narrowness allows a faster transistor, and the heavy doping reduces the resistance of the narrow layer. The process does not require high temperature annealing; therefore materials such as aluminum can be used. Furthermore, the process may be used to fabricate diodes that have a high reverse breakdown voltage and a low reverse leakage current.

  10. Structural evaluation of InAsP/InGaAsP strained-layer superlattices with dislocations as grown by metal-organic molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Nakashima, Kiichi; Sugiura, Hideo

    1997-08-01

    The relaxation process in InAsP/InGaAsP strained-layer superlattices (SLSs) with interfacial misfit dislocations has been investigated systematically by transmission electron microscopy (TEM) and x-ray analyses. The TEM analysis reveals that dislocations locate a little inside the buffer layer near the interface between the buffer and first well layer in the SLS. The x-ray analysis of (400) azimuthal angle dependence indicates the buffer layer has a large macroscopic tilt. Using a curve fitting analysis of various (hkl) x-ray profiles and reciprocal lattice mapping measurements, residual strain was determined quantitatively, i.e., Δa∥ and Δa⊥, in the SLS and buffer layer. These results reveal that the dislocations mainly cause lattice distortion of the buffer layer rather than relaxation of the SLS layer. The most remarkable result is that the change of a∥ is not equal to that of a⊥ in the buffer layer. This phenomenon strongly suggests that microplastic domains are generated in the buffer layer.

  11. Epitaxial growth of Si deposited on (100) Si

    NASA Astrophysics Data System (ADS)

    Hung, L. S.; Lau, S. S.; von Allmen, M.; Mayer, J. W.; Ullrich, B. M.; Baker, J. E.; Williams, P.; Tseng, W. F.

    1980-11-01

    Epitaxial growth of deposited amorphous Si on chemically cleaned (100) Si has been found and layer-by-layer growth occurred at rates comparable to those in self-ion-implanted-amorphous Si. There is no evidence for appreciable oxygen penetration into the deposited layer during storage in air. The critical factors in achieving epitaxial growth are fast (˜50 Å/sec) deposition of Si onto a surface cleaned with a HF dip as a last rinse before loading into the vacuum system. Channeling and transmission electron microscopy measurements indicated that the epitaxial layers are essentially defect free. Secondary-ion mass spectroscopic analysis showed about 1014 oxygen/cm2 at the amorphous/crystal interface. With either higher interfacial oxygen coverage or slow (˜2 Å/sec) deposition, epitaxial growth rates are significantly slower.

  12. Epitaxial growth of large area single-crystalline few-layer MoS{sub 2} with high space charge mobility of 192 cm{sup 2} V{sup −1} s{sup −1}

    SciTech Connect

    Ma, Lu; Yu, Mingzhe; Wu, Yiying E-mail: wu@chemistry.ohio-state.edu; Nath, Digbijoy N.; Lee, Edwin W.; Lee, Choong Hee; Arehart, Aaron; Rajan, Siddharth E-mail: wu@chemistry.ohio-state.edu

    2014-08-18

    We report on the vapor-solid growth of single crystalline few-layer MoS{sub 2} films on (0001)-oriented sapphire with excellent structural and electrical properties over centimeter length scale. High-resolution X-ray diffraction scans indicated that the films had good out-of-plane ordering and epitaxial registry. A carrier density of ∼2 × 10{sup 11 }cm{sup −2} and a room temperature mobility of 192 cm{sup 2}/Vs were extracted from space-charge limited transport regime in the films. The electron mobility was found to exhibit in-plane anisotropy with a ratio of ∼1.8. Theoretical estimates of the temperature-dependent electron mobility including optical phonon, acoustic deformation potential, and remote ionized impurity scattering were found to satisfactorily match the measured data. The synthesis approach reported here demonstrates the feasibility of device quality few-layer MoS{sub 2} films with excellent uniformity and high quality.

  13. Epitaxial growth of Ce 2Y 2O 7 buffer layers for YBa 2Cu 3O 7-δ coated conductors using reel-to-reel DC reactive sputtering

    NASA Astrophysics Data System (ADS)

    Fan, F.; Lu, Y. M.; Ying, L. L.; Liu, Z. Y.; Cai, C. B.; Hühne, R.; Holzapfel, B.

    2011-08-01

    Biaxially textured Ce 2Y 2O 7 (CYO) films were deposited on Ni-5at.%W (Ni-5W) tapes by a DC reactive sputtering technique in a reel-to-reel system. Subsequent YBa 2Cu 3O 7-δ (YBCO) films were prepared using pulsed laser deposition leading to a simplified coated conductor architecture of YBCO/CYO/Ni-5W. X-ray diffraction measurements revealed an epitaxial growth of the CYO buffer layer with a texture spread down to 2.2° and 4.7° for the out-of-plane and in-plane alignment, respectively. Microstructural investigations showed a dense, smooth and crack-free surface morphology for CYO film up to a thickness of 350 nm, implying an effective suppression of cracks due to the incorporation of Y in CeO 2. The superconducting transition temperature T c of about 90 K with a narrow transition of 0.8 K and the inductively measured critical current density J c of about 0.7 MA/cm 2 indicate the potential of the single CYO buffer layer.

  14. P-type and N-type doping in GaSb and Ga{sub 0.8}In{sub 0.2}Sb layers grown by metalorganic vapor phase epitaxy

    SciTech Connect

    Ehsani, H.; Bhat, I.; Hitchcock, C.; Gutmann, R.J.; Charache, G.; Freeman, M.

    1998-06-01

    P-type and n-type GaSb and GA{sub 0.8}In{sub 0.2}Sb layers have been grown on GaSb and GaAs substrates by metalorganic vapor phase epitaxy (MOVPE) using silane and diethyltellurium (DETe) as the dopant precursors, respectively. Hall measurements show that the concentration and mobility of holes and electrons in GaSb and GA{sub 0.8}In{sub 0.2}Sb are higher when the layers are grown on GaSb substrates than when grown on GaAs substrates. Secondary ion mass spectrometry (SIMS) results show that the incorporation of Si and Te is higher when GaSb substrates are used. The electron concentration increased from 5 {times} 10{sup 16} cm{sup {minus}3} to 1.5 {times} 10{sup 18} cm{sup {minus}3} as the Te concentration was increased from 1 {times} 10{sup 17} cm{sup {minus}3} to 5 {times} 10{sup 18} cm{sup {minus}3}. As the Te concentration was increased further, the electron concentration decreased, with only about 1% of the Te electrically active at a Te concentration of 2 {times} 10{sup 20} cm{sup {minus}3}.

  15. Pulsed growth techniques in plasma-assisted molecular beam epitaxy of AlxGa1-xN layers with medium Al content (x=0.4-0.6)

    NASA Astrophysics Data System (ADS)

    Nechaev, D. V.; Brunkov, P. N.; Troshkov, S. I.; Jmerik, V. N.; Ivanov, S. V.

    2015-09-01

    Paper presents the comparative analysis of Metal Modulated Epitaxy (MME) and Droplet Elimination by Thermal Annealing (DETA) techniques in the low-temperature plasma-assisted MBE of thick AlxGa1-xN layers with the medium Al content (x=0.4-0.6) grown under the highly metal-rich conditions. Atomically smooth surface with RMS of about 0.4 nm across the area of 2×2 μm2 has been achieved for AlGaN layers grown at FIII/FN flux ratio of 2.5 and substrate temperature of 700 °C by using DETA. The MME growth of AlGaN epilayers leads to their cracking due to the tensile stress introduced by relaxed GaN interlayers which are formed during the nitrogen exposure of the Ga-enriched AlGaN surface. A new technique based on IR-pyrometry measurements has been developed to monitor in situ metal accumulation and depletion on the growth surface.

  16. Characterization of interface reaction of Ti/Al-based ohmic contacts on AlGaN/GaN epitaxial layers on GaN substrate

    NASA Astrophysics Data System (ADS)

    Zadeh, Daryoush H.; Tanabe, Shinichi; Watanabe, Noriyuki; Matsuzaki, Hideaki

    2016-05-01

    The ohmic properties of Ti/Al/Mo/Au contacts on a high-quality AlGaN/GaN heterostructure epitaxially grown on a GaN substrate were investigated. Systematic structural and electrical analyses of the metal/AlGaN interface after annealing in N2 at 700 and 900 °C were conducted. After annealing at 900 °C, a new Al-rich interlayer with nitrogen vacancies was formed at the metal/AlGaN interface. Ohmic contacts with a low specific contact resistance (ρc) of 5.1 × 10-6 Ω cm2 and a dominant field emission carrier transport mechanism were achieved. The fabrication of recessed-AlGaN-structured ohmic contact with ρc as low as 2.4 × 10-5 Ω cm2 at a low annealing temperature of 650 °C, was also successfully demonstrated. This result indicates that a process methodology can be provided for fabricating low-resistivity ohmic contacts with a low thermal budget on a high-quality AlGaN/GaN structure, which is based on an appropriate control of the metal/AlGaN interface and AlGaN thickness rather than relying on the existence of threading dislocations.

  17. Bond length variation in In0.25Ga0.75As/InP epitaxial layers thicker than the critical thickness

    NASA Astrophysics Data System (ADS)

    Tormen, M.; De Salvador, D.; Natali, M.; Drigo, A.; Romanato, F.; Rossetto, G.; Boscherini, F.; Mobilio, S.

    1999-09-01

    We address the issue of the local structure in an epitaxial semiconductor thin film undergoing strain relaxation due to extended defects when the critical thickness for their introduction is exceeded. The nearest neighbor environment is probed by x-ray absorption fine structure spectroscopy. The particular system studied is a set of In0.25Ga0.75As films grown on InP(001) of increasing thickness; the thicknesses were chosen so as to obtain a varying degree of relaxation, ranging from pseudomorphic growth to completely relaxed state. The samples have been thoroughly characterized with complementary structural techniques and the residual strain is measured by x-ray diffraction. We find that the Ga-As bond length exhibits a linear decrease with decreasing residual strain. By comparing these results with previous studies on bond lengths in pseudomorphic InxGa1-xAs films as a function of concentration we conclude that the bond lengths have an identical behavior as a function of the mean residual strain independently from its elastic or plastic origin. This result is reproduced by an analytical model based on the transfer of the mean macroscopic deformation at a local level. The broadening of the bond length distribution induced by extended defects is also discussed, concluding that it is not experimentally dectable.

  18. Nondestructive Characterization of Residual Threading Dislocation Density in HgCdTe Layers Grown on CdZnTe by Liquid-Phase Epitaxy

    NASA Astrophysics Data System (ADS)

    Fourreau, Y.; Pantzas, K.; Patriarche, G.; Destefanis, V.

    2016-09-01

    The performance of mercury cadmium telluride (MCT)-based infrared (IR) focal-plane arrays is closely related to the crystalline perfection of the HgCdTe thin film. In this work, Te-rich, (111)B-oriented HgCdTe epilayers grown by liquid-phase epitaxy on CdZnTe substrates have been studied. Surface atomic steps are shown on as-grown MCT materials using atomic force microscopy (AFM) and white-light interferometry (WLI), suggesting step-flow growth. Locally, quasiperfect surface spirals are also evidenced. A demonstration is given that these spirals are related to the emergence of almost pure screw threading dislocations. A nondestructive and quantitative technique to measure the threading dislocation density is proposed. The technique consists of counting the surface spirals on the as-grown MCT surface from images obtained by either AFM or WLI measurements. The benefits and drawbacks of both destructive—chemical etching of HgCdTe dislocations—and nondestructive surface imaging techniques are compared. The nature of defects is also discussed. Finally, state-of-the-art threading dislocation densities in the low 104 cm-2 range are evidenced by both etch pit density (EPD) and surface imaging measurements.

  19. Encapsulated solid phase epitaxy of a Ge quantum well embedded in an epitaxial rare earth oxide.

    PubMed

    Laha, Apurba; Bugiel, E; Jestremski, M; Ranjith, R; Fissel, A; Osten, H J

    2009-11-25

    An efficient method based on molecular beam epitaxy has been developed to integrate an epitaxial Ge quantum well buried into a single crystalline rare earth oxide. The monolithic heterostructure comprised of Gd2O3-Ge-Gd2O3 grown on an Si substrate exhibits excellent crystalline quality with atomically sharp interfaces. This heterostructure with unique structural quality could be used for novel nanoelectronic applications in quantum-effect devices such as nanoscale transistors with a high mobility channel, resonant tunneling diode/transistors, etc. A phenomenological model has been proposed to explain the epitaxial growth process of the Ge layer under oxide encapsulation using a solid source molecular beam epitaxy technique. PMID:19875877

  20. Characterization of vertical Au/β-Ga2O3 single-crystal Schottky photodiodes with MBE-grown high-resistivity epitaxial layer

    NASA Astrophysics Data System (ADS)

    X, Z. Liu; C, Yue; C, T. Xia; W, L. Zhang

    2016-01-01

    High-resistivity β-Ga2O3 thin films were grown on Si-doped n-type conductive β-Ga2O3 single crystals by molecular beam epitaxy (MBE). Vertical-type Schottky diodes were fabricated, and the electrical properties of the Schottky diodes were studied in this letter. The ideality factor and the series resistance of the Schottky diodes were estimated to be about 1.4 and 4.6× 106 Ω. The ionized donor concentration and the spreading voltage in the Schottky diodes region are about 4 × 1018 cm-3 and 7.6 V, respectively. The ultra-violet (UV) photo-sensitivity of the Schottky diodes was demonstrated by a low-pressure mercury lamp illumination. A photoresponsivity of 1.8 A/W and an external quantum efficiency of 8.7 × 102% were observed at forward bias voltage of 3.8 V, the proper driving voltage of read-out integrated circuit for UV camera. The gain of the Schottky diode was attributed to the existence of a potential barrier in the i-n junction between the MBE-grown highly resistive β-Ga2O3 thin films and the n-type conductive β-Ga2O3 single-crystal substrate. Project supported by the National Nature Science Foundation of China (Grant No. 61223002) the Science and Technology Commission of Shanghai Municipality, China (Grant No. 13111103700), and the Specialized Research Fund for the Doctoral Program of Higher Education of China (Grant No. 2012018530003).

  1. Chemical vapor deposition of epitaxial silicon

    DOEpatents

    Berkman, Samuel

    1984-01-01

    A single chamber continuous chemical vapor deposition (CVD) reactor is described for depositing continuously on flat substrates, for example, epitaxial layers of semiconductor materials. The single chamber reactor is formed into three separate zones by baffles or tubes carrying chemical source material and a carrier gas in one gas stream and hydrogen gas in the other stream without interaction while the wafers are heated to deposition temperature. Diffusion of the two gas streams on heated wafers effects the epitaxial deposition in the intermediate zone and the wafers are cooled in the final zone by coolant gases. A CVD reactor for batch processing is also described embodying the deposition principles of the continuous reactor.

  2. Efficient spin injection through a crystalline AlOx tunnel barrier prepared by the oxidation of an ultra-thin Al epitaxial layer on GaAs

    NASA Astrophysics Data System (ADS)

    Nishizawa, N.; Munekata, H.

    2013-07-01

    We report that an ultra-thin, post-oxidized aluminum epilayer grown on the AlGaAs surface works as a high-quality tunnel barrier for spin injection from a ferromagnetic metal to a semiconductor. One of the key points of the present oxidation method is the formation of the crystalline AlOx template layer without oxidizing the AlGaAs region near the Al/AlGaAs interface. The oxidized Al layer is not amorphous but show well-defined single crystalline feature reminiscent of the spinel γ-AlOx phase. A spin-light emitting diode consisting of a Fe layer, a crystalline AlOx barrier layer, and an AlGaAs-InGaAs double hetero-structure has exhibited circularly polarized electroluminescence with circular polarization of PEL ˜ 0.145 at the remnant magnetization state of the Fe layer, indicating the relatively high spin injection efficiency (≡2PEL/PFe) of 0.63.

  3. Epitaxy of GaN Nanowires on Graphene.

    PubMed

    Kumaresan, Vishnuvarthan; Largeau, Ludovic; Madouri, Ali; Glas, Frank; Zhang, Hezhi; Oehler, Fabrice; Cavanna, Antonella; Babichev, Andrey; Travers, Laurent; Gogneau, Noelle; Tchernycheva, Maria; Harmand, Jean-Christophe

    2016-08-10

    Epitaxial growth of GaN nanowires on graphene is demonstrated using molecular beam epitaxy without any catalyst or intermediate layer. Growth is highly selective with respect to silica on which the graphene flakes, grown by chemical vapor deposition, are transferred. The nanowires grow vertically along their c-axis and we observe a unique epitaxial relationship with the ⟨21̅1̅0⟩ directions of the wurtzite GaN lattice parallel to the directions of the carbon zigzag chains. Remarkably, the nanowire density and height decrease with increasing number of graphene layers underneath. We attribute this effect to strain and we propose a model for the nanowire density variation. The GaN nanowires are defect-free and they present good optical properties. This demonstrates that graphene layers transferred on amorphous carrier substrates is a promising alternative to bulk crystalline substrates for the epitaxial growth of high quality GaN nanostructures.

  4. Epitaxy of GaN Nanowires on Graphene.

    PubMed

    Kumaresan, Vishnuvarthan; Largeau, Ludovic; Madouri, Ali; Glas, Frank; Zhang, Hezhi; Oehler, Fabrice; Cavanna, Antonella; Babichev, Andrey; Travers, Laurent; Gogneau, Noelle; Tchernycheva, Maria; Harmand, Jean-Christophe

    2016-08-10

    Epitaxial growth of GaN nanowires on graphene is demonstrated using molecular beam epitaxy without any catalyst or intermediate layer. Growth is highly selective with respect to silica on which the graphene flakes, grown by chemical vapor deposition, are transferred. The nanowires grow vertically along their c-axis and we observe a unique epitaxial relationship with the ⟨21̅1̅0⟩ directions of the wurtzite GaN lattice parallel to the directions of the carbon zigzag chains. Remarkably, the nanowire density and height decrease with increasing number of graphene layers underneath. We attribute this effect to strain and we propose a model for the nanowire density variation. The GaN nanowires are defect-free and they present good optical properties. This demonstrates that graphene layers transferred on amorphous carrier substrates is a promising alternative to bulk crystalline substrates for the epitaxial growth of high quality GaN nanostructures. PMID:27414518

  5. Epitaxial solar-cell fabrication, phase 2

    NASA Technical Reports Server (NTRS)

    Daiello, R. V.; Robinson, P. H.; Kressel, H.

    1977-01-01

    Dichlorosilane (SiH2Cl2) was used as the silicon source material in all of the epitaxial growths. Both n/p/p(+) and p/n/n(+) structures were studied. Correlations were made between the measured profiles and the solar cell parameters, especially cell open-circuit voltage. It was found that in order to obtain consistently high open-circuit voltage, the epitaxial techniques used to grow the surface layer must be altered to obtain very abrupt doping profiles in the vicinity of the junction. With these techniques, it was possible to grow reproducibly both p/n/n(+) and n/p/p(+) solar cell structures having open-circuit voltages in the 610- to 630-mV range, with fill-factors in excess of 0.80 and AM-1 efficiencies of about 13%. Combinations and comparisons of epitaxial and diffused surface layers were also made. Using such surface layers, we found that the blue response of epitaxial cells could be improved, resulting in AM-1 short-circuit current densities of about 30 mA/cm sq. The best cells fabricated in this manner had AM-1 efficiency of 14.1%.

  6. Effect of Group-III precursors on unintentional gallium incorporation during epitaxial growth of InAlN layers by metalorganic chemical vapor deposition

    SciTech Connect

    Kim, Jeomoh Ji, Mi-Hee; Detchprohm, Theeradetch; Dupuis, Russell D.; Fischer, Alec M.; Ponce, Fernando A.; Ryou, Jae-Hyun

    2015-09-28

    Unintentional incorporation of gallium (Ga) in InAlN layers grown with different molar flow rates of Group-III precursors by metalorganic chemical vapor deposition has been experimentally investigated. The Ga mole fraction in the InAl(Ga)N layer was increased significantly with the trimethylindium (TMIn) flow rate, while the trimethylaluminum flow rate controls the Al mole fraction. The evaporation of metallic Ga from the liquid phase eutectic system between the pyrolized In from injected TMIn and pre-deposited metallic Ga was responsible for the Ga auto-incorporation into the InAl(Ga)N layer. The theoretical calculation on the equilibrium vapor pressure of liquid phase Ga and the effective partial pressure of Group-III precursors based on growth parameters used in this study confirms the influence of Group-III precursors on Ga auto-incorporation. More Ga atoms can be evaporated from the liquid phase Ga on the surrounding surfaces in the growth chamber and then significant Ga auto-incorporation can occur due to the high equilibrium vapor pressure of Ga comparable to effective partial pressure of input Group-III precursors during the growth of InAl(Ga)N layer.

  7. Effect of Group-III precursors on unintentional gallium incorporation during epitaxial growth of InAlN layers by metalorganic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Kim, Jeomoh; Ji, Mi-Hee; Detchprohm, Theeradetch; Dupuis, Russell D.; Fischer, Alec M.; Ponce, Fernando A.; Ryou, Jae-Hyun

    2015-09-01

    Unintentional incorporation of gallium (Ga) in InAlN layers grown with different molar flow rates of Group-III precursors by metalorganic chemical vapor deposition has been experimentally investigated. The Ga mole fraction in the InAl(Ga)N layer was increased significantly with the trimethylindium (TMIn) flow rate, while the trimethylaluminum flow rate controls the Al mole fraction. The evaporation of metallic Ga from the liquid phase eutectic system between the pyrolized In from injected TMIn and pre-deposited metallic Ga was responsible for the Ga auto-incorporation into the InAl(Ga)N layer. The theoretical calculation on the equilibrium vapor pressure of liquid phase Ga and the effective partial pressure of Group-III precursors based on growth parameters used in this study confirms the influence of Group-III precursors on Ga auto-incorporation. More Ga atoms can be evaporated from the liquid phase Ga on the surrounding surfaces in the growth chamber and then significant Ga auto-incorporation can occur due to the high equilibrium vapor pressure of Ga comparable to effective partial pressure of input Group-III precursors during the growth of InAl(Ga)N layer.

  8. Structural defects in epitaxial graphene layers synthesized on C-terminated 4H-SiC (0001¯) surface—Transmission electron microscopy and density functional theory studies

    NASA Astrophysics Data System (ADS)

    Borysiuk, J.; Sołtys, J.; Piechota, J.; Krukowski, S.; Baranowski, J. M.; Stepniewski, R.

    2014-02-01

    The principal structural defects in graphene multilayers synthesized on the carbon-terminated face of a 4H-SiC (0001¯) substrate were investigated using the high-resolution transmission electron microscopy. The analyzed systems include a wide variety of defected structures such as edge dislocations, rotational multilayers, and grain boundaries. It was shown that graphene layers are composed of grains of the size of several nanometres or larger; they differ in a relative rotation by large angles, close to 30°. The structure of graphene multilayers results from the synthesis on a SiC (0001¯) surface, which proceeds via intensive nucleation of new graphene layers that coalesce under various angles creating an immense orientational disorder. Structural defects are associated with a built-in strain resulting from a lattice mismatch between the SiC substrate and the graphene layers. The density functional theory data show that the high-angular disorder of AB stacked bi-layers is not restoring the hexagonal symmetry of the lattice.

  9. Conductive and robust nitride buffer layers on biaxially textured substrates

    DOEpatents

    Sankar, Sambasivan; Goyal, Amit; Barnett, Scott A.; Kim, Ilwon; Kroeger, Donald M.

    2004-08-31

    The present invention relates to epitaxial, electrically conducting and mechanically robust, cubic nitride buffer layers deposited epitaxially on biaxially textured substrates such as metal and alloys. The invention comprises of a biaxially textured substrate with epitaxial layers of nitrides. The invention also discloses a method to form such epitaxial layers using a high rate deposition method as well as without the use of forming gases. The invention further comprises epitaxial layers of oxides on the biaxially textured nitride layers. In some embodiments the article further comprises electromagnetic devices which may be super conducting properties.

  10. Conductive and robust nitride buffer layers on biaxially textured substrates

    DOEpatents

    Sankar, Sambasivan [Chicago, IL; Goyal, Amit [Knoxville, TN; Barnett, Scott A [Evanston, IL; Kim, Ilwon [Skokie, IL; Kroeger, Donald M [Knoxville, TN

    2009-03-31

    The present invention relates to epitaxial, electrically conducting and mechanically robust, cubic nitride buffer layers deposited epitaxially on biaxially textured substrates such as metals and alloys. The invention comprises of a biaxially textured substrate with epitaxial layers of nitrides. The invention also discloses a method to form such epitaxial layers using a high rate deposition method as well as without the use of forming gases. The invention further comprises epitaxial layers of oxides on the biaxially textured nitride layer. In some embodiments the article further comprises electromagnetic devices which may have superconducting properties.

  11. Cosine (Cobalt Silicide Growth Through Nitrogen-Induced Epitaxy) Process For Epitaxial Cobalt Silicide Formation For High Performance Sha

    SciTech Connect

    Lim, Chong Wee; Shin, Chan Soo; Gall, Daniel; Petrov, Ivan Georgiev; Greene, Joseph E.

    2004-09-28

    A method for forming an epitaxial cobalt silicide layer on a MOS device includes sputter depositing cobalt in an ambient to form a first layer of cobalt suicide on a gate and source/drain regions of the MOS device. Subsequently, cobalt is sputter deposited again in an ambient of argon to increase the thickness of the cobalt silicide layer to a second thickness.

  12. Epitaxial growth of three dimensionally structured III-V photonic crystal via hydride vapor phase epitaxy

    SciTech Connect

    Zheng, Qiye; Kim, Honggyu; Zhang, Runyu; Zuo, Jianmin; Braun, Paul V.; Sardela, Mauro; Balaji, Manavaimaran; Lourdudoss, Sebastian; Sun, Yan-Ting

    2015-12-14

    Three-dimensional (3D) photonic crystals are one class of materials where epitaxy, and the resultant attractive electronic properties, would enable new functionalities for optoelectronic devices. Here we utilize self-assembled colloidal templates to fabricate epitaxially grown single crystal 3D mesostructured Ga{sub x}In{sub 1−x}P (GaInP) semiconductor photonic crystals using hydride vapor phase epitaxy (HVPE). The epitaxial relationship between the 3D GaInP and the substrate is preserved during the growth through the complex geometry of the template as confirmed by X-ray diffraction (XRD) and high resolution transmission electron microscopy. XRD reciprocal space mapping of the 3D epitaxial layer further demonstrates the film to be nearly fully relaxed with a negligible strain gradient. Fourier transform infrared spectroscopy reflection measurement indicates the optical properties of the photonic crystal which agree with finite difference time domain simulations. This work extends the scope of the very few known methods for the fabrication of epitaxial III-V 3D mesostructured materials to the well-developed HVPE technique.

  13. Crystal orientation dependence of current-perpendicular-to-plane giant magnetoresistance of pseudo spin-valves with epitaxial Co{sub 2}Fe(Ge{sub 0.5}Ga{sub 0.5}) Heusler alloy layers

    SciTech Connect

    Chen, Jiamin; Hono, K.; Li, Songtian; Furubayashi, T. Takahashi, Y. K.

    2014-06-21

    The magnetoresistive (MR) properties of Co{sub 2}Fe(Ge{sub 0.5}Ga{sub 0.5}) (CFGG) Heusler alloy-based current-perpendicular-to-plane giant magnetoresistance pseudo-spin-valves (PSVs) are investigated. The PSV films are epitaxially grown on a sapphire (112{sup ¯}0) substrate with an Ag or Cu spacer layer, and their magnetoresistive properties are compared with those of PSV grown on MgO(001) substrates. For substrates with an Ag spacer, the PSV with the (001)[110]{sub CFGG}//(001)[010]{sub Ag} interface grown on MgO(001) exhibits a higher MR output compared with the (110)[001]{sub CFGG}//(111)[11{sup ¯}0]{sub Ag} interface grown on sapphire (112{sup ¯}0). In contrast, a higher MR output is obtained using a Cu spacer with the (110)[001]{sub CFGG}//(111)[11{sup ¯}0]{sub Cu} interface. These results demonstrate that the MR outputs depend upon the crystal orientation at the interface, and that interfaces with a small misfit tend to exhibit a larger MR output. This indicates the influence of crystal orientation as well as lattice mismatch upon the interfacial spin scattering asymmetry.

  14. An ab initio study of MgO epitaxial layers on a Co2MnSi (0 0 1) surface: influence of the interface structure on tunnelling conductance

    NASA Astrophysics Data System (ADS)

    Yu, H. L.; Jiang, X. F.; Zheng, Y.; Yang, G. W.

    2012-08-01

    The formation of MgO epitaxial layers on a Co2MnSi (0 0 1) surface was studied using the ab initio electronic structure calculations based on the density functional theory. The free energy calculations showed that the O-rich, O-top and Mg-rich configurations in the CoCo termination case, and the O-rich and O-top configurations in the MnSi termination case were thermodynamically stable. The magnetic and electronic properties of these stable configurations were investigated in detail, and the results indicated that only the Mg-rich configuration with CoCo termination exhibited near half-metallic properties at the interface. The influence of the interfacial structure on the tunnelling conductance of the Co2MnSi/MgO/Co2MnSi magnetic tunnel junctions (MTJs) was also discussed using the nonequilibrium Green's function method. The attained conductance showed that a large difference of up to 104 was observed in the magnitude of parallel conductance, which means that the interface structure plays a crucial role in the electronic transport of the MTJ. These findings are useful in designing MTJs with high performance.

  15. Structural and morphological properties of GaN buffer layers grown by ammonia molecular beam epitaxy on SiC substrates for AlGaN/GaN high electron mobility transistors

    SciTech Connect

    Corrion, A. L.; Poblenz, C.; Wu, F.; Speck, J. S.

    2008-05-01

    The impact of growth conditions on the surface morphology and structural properties of ammonia molecular beam epitaxy GaN buffers layers on SiC substrates was investigated. The threading dislocation (TD) density was found to decrease with decreasing NH{sub 3}:Ga flux ratio, which corresponded to an increase in surface roughness and reduction in residual compressive lattice mismatch stress. Furthermore, the dislocation density and compressive stress decreased for increasing buffer thickness. TD inclination was proposed to account for these observations. Optimized surface morphologies were realized at high NH{sub 3}:Ga flux ratios and were characterized by monolayer-high steps, spiral hillocks, and pyramidal mounds, with rms roughness of {approx}1.0 nm over 2x2 {mu}m{sup 2} atomic force microscopy images. Smooth surface morphologies were realized over a large range of growth temperatures and fluxes, and growth rates of up to 1 {mu}m/h were achieved. TD densities in the buffers as low as 3x10{sup 9} cm{sup -2} were demonstrated. These buffers were highly insulating and were used in recently reported AlGaN/GaN HEMTs with power densities of >11 W/mm at 4 and 10 GHz.

  16. Growth of (111) GaAs on (111) Si using molecular-beam epitaxy

    NASA Technical Reports Server (NTRS)

    Radhakrishnan, G.; Liu, J.; Grunthaner, F.; Katz, J.; Morkoc, H.

    1988-01-01

    (111) GaAs layers have been grown epitaxially on (111) Si wafers, both on-axis as well as 3-deg off-axis towards the 1 -1 0 direction, using molecular-beam epitaxy. The grown layers have been characterized by scanning electron microscopy, X-ray diffraction, and transmission electron microscopy.

  17. Epitaxial growth and thermal dynamics of CeO II buffer layer on textured Ni-W substrates for YBCO coated conductors

    NASA Astrophysics Data System (ADS)

    Pan, C. Y.; Cai, C. B.; Ying, L. L.; Lu, Y. M.; Liu, Z. Y.; Gao, B.; Liu, J. L.

    2008-02-01

    In present study, the biaxially textured CeO II buffer layers on Ni-W substrates have been prepared by chemical solution deposition (CSD) with cerium acetate as the starting precursor, mixed with solvents of Propionic acid, Isopropanol and Acetylacetone. Typical XRD θ-2θ scans and the pole figure display well out-of-plane and in-plane textures of CeO II films. SEM and AFM results suggest that the buffer layer have uniform and smooth surface. Meanwhile, the effects of heating rate on CeO II formation starting from the precursor solution have been studied using differential thermal analysis (DTA). And the further analysis is given by XRD results for precursor xrogel at the corresponding temperature. Detailed high temperature optical microscope (HTOM) photographs investigate the surface characteristics evolved with temperature.

  18. Preferentially etched epitaxial liftoff of InP material

    NASA Technical Reports Server (NTRS)

    Bailey, Sheila G. (Inventor); Wilt, David M. (Inventor); Deangelo, Frank L. (Inventor)

    1995-01-01

    The present invention is directed toward a method of removing epitaxial substrates from host substrates. A sacrificial release layer of ternary material is placed on the substrate. A layer of InP is then placed on the ternary material. Afterward a layer of wax is applied to the InP layer to apply compressive force and an etchant material is used to remove the sacrificial release layer.

  19. Novel InGaAs contact layer growth for hetero-junction bipolar transistors (HBTs) by using the multiple group-V source molecular beam epitaxy (MBE) system

    NASA Astrophysics Data System (ADS)

    Kadoiwa, Kaoru; Izumi, Shigekazu; Yamamoto, Yoshitsugu; Hayafuji, Norio; Sonoda, Takuji

    1999-05-01

    Dependence of layer surface morphology and electrical properties on growth conditions, growth temperature and supplying conditions of group-V sources such as solid-As and AsH 3 hydride gas, has been investigated with specially designed MBE system, including both solid-As source cell and gas source cracking cell, for highly lattice-mismatched (+4%) In 0.5Ga 0.5As layer grown on GaAs. We demonstrate that utilizing of AsH 3 hydride source enables us to obtain a superior smooth surface in comparison with utilizing solid-As source. The HAZE level for the former source is reduced to one twentieth of the latter. The advantage of gas-source MBE (GS-MBE) method (hydrogen effect) was realized as suppressing In segregation. The effective hydrogen comes from AsH 3 hydride that acts as the surfactant that controls coherent small 3D islands formation during initial growth stage. The optimized GS-MBE growth method, under AsH 3 flow rate of 3 SCCM and growth temperature of 470°C, establishes that the In xGa 1- xAs ( x=0.6) layer grown on GaAs with the surface is as smooth as the surface of GaAs substrate, and also shows the contact resistance to be 4×10 -8 Ω cm 2. This value is well-fitted for nonalloy ohmic contact by using W/Si as emitter electrodes for HBTs.

  20. Point defect balance in epitaxial GaSb

    SciTech Connect

    Segercrantz, N. Slotte, J.; Makkonen, I.; Kujala, J.; Tuomisto, F.; Song, Y.; Wang, S.

    2014-08-25

    Positron annihilation spectroscopy in both conventional and coincidence Doppler broadening mode is used for studying the effect of growth conditions on the point defect balance in GaSb:Bi epitaxial layers grown by molecular beam epitaxy. Positron annihilation characteristics in GaSb are also calculated using density functional theory and compared to experimental results. We conclude that while the main positron trapping defect in bulk samples is the Ga antisite, the Ga vacancy is the most prominent trap in the samples grown by molecular beam epitaxy. The results suggest that the p–type conductivity is caused by different defects in GaSb grown with different methods.

  1. Process for depositing an oxide epitaxially onto a silicon substrate and structures prepared with the process

    DOEpatents

    McKee, Rodney A.; Walker, Frederick J.

    1993-01-01

    A process and structure involving a silicon substrate utilizes an ultra high vacuum and molecular beam epitaxy (MBE) methods to grow an epitaxial oxide film upon a surface of the substrate. As the film is grown, the lattice of the compound formed at the silicon interface becomes stabilized, and a base layer comprised of an oxide having a sodium chloride-type lattice structure grows epitaxially upon the compound so as to cover the substrate surface. A perovskite may then be grown epitaxially upon the base layer to render a product which incorporates silicon, with its electronic capabilities, with a perovskite having technologically-significant properties of its own.

  2. Growth of epitaxial thin films by pulsed laser ablation

    SciTech Connect

    Lowndes, D.H.

    1992-01-01

    High-quality, high-temperature superconductor (HTSc) films can be grown by the pulsed laser ablation (PLA) process. This article provides a detailed introduction to the advantages and curent limitations of PLA for epitaxial film growth. Emphasis is placed on experimental methods and on exploitation of PLA to control epitaxial growth at either the unit cell or the atomic-layer level. Examples are taken from recent HTSc film growth. 33 figs, 127 refs. (DLC)

  3. Growth of epitaxial thin films by pulsed laser ablation

    SciTech Connect

    Lowndes, D.H.

    1992-10-01

    High-quality, high-temperature superconductor (HTSc) films can be grown by the pulsed laser ablation (PLA) process. This article provides a detailed introduction to the advantages and curent limitations of PLA for epitaxial film growth. Emphasis is placed on experimental methods and on exploitation of PLA to control epitaxial growth at either the unit cell or the atomic-layer level. Examples are taken from recent HTSc film growth. 33 figs, 127 refs. (DLC)

  4. Process for growing epitaxial gallium nitride and composite wafers

    DOEpatents

    Weber, Eicke R.; Subramanya, Sudhir G.; Kim, Yihwan; Kruger, Joachim

    2003-05-13

    A novel growth procedure to grow epitaxial Group III metal nitride thin films on lattice-mismatched substrates is proposed. Demonstrated are the quality improvement of epitaxial GaN layers using a pure metallic Ga buffer layer on c-plane sapphire substrate. X-ray rocking curve results indicate that the layers had excellent structural properties. The electron Hall mobility increases to an outstandingly high value of .mu.>400 cm.sup.2 /Vs for an electron background concentration of 4.times.10.sup.17 cm.sup.-3.

  5. Layers

    NASA Astrophysics Data System (ADS)

    Hong, K. J.; Jeong, T. S.; Youn, C. J.

    2014-09-01

    The temperature-dependent photoresponse characteristics of MnAl2S4 layers have been investigated, for the first time, by use of photocurrent (PC) spectroscopy. Three peaks were observed at all temperatures. The electronic origin of these peaks was associated with band-to-band transitions from the valence-band states Γ4( z), Γ5( x), and Γ5( y) to the conduction-band state Γ1( s). On the basis of the relationship between PC-peak energy and temperature, the optical band gap could be well expressed by the expression E g( T) = E g(0) - 2.80 × 10-4 T 2/(287 + T), where E g(0) was estimated to be 3.7920 eV, 3.7955 eV, and 3.8354 eV for the valence-band states Γ4( z), Γ5( x), and Γ5( y), respectively. Results from PC spectroscopy revealed the crystal-field and spin-orbit splitting were 3.5 meV and 39.9 meV. The gradual decrease of PC intensity with decreasing temperature can be explained on the basis of trapping centers associated with native defects in the MnAl2S4 layers. Plots of log J ph, the PC current density, against 1/ T, revealed a dominant trap level in the high-temperature region. By comparing PC and the Hall effect results, we confirmed that this trap level is a shallow donor 18.9 meV below the conduction band.

  6. High throughput vacuum chemical epitaxy

    NASA Astrophysics Data System (ADS)

    Fraas, L. M.; Malocsay, E.; Sundaram, V.; Baird, R. W.; Mao, B. Y.; Lee, G. Y.

    1990-10-01

    We have developed a vacuum chemical epitaxy (VCE) reactor which avoids the use of arsine and allows multiple wafers to be coated at one time. Our vacuum chemical epitaxy reactor closely resembles a molecular beam epitaxy system in that wafers are loaded into a stainless steel vacuum chamber through a load chamber. Also as in MBE, arsenic vapors are supplied as reactant by heating solid arsenic sources thereby avoiding the use of arsine. However, in our VCE reactor, a large number of wafers are coated at one time in a vacuum system by the substitution of Group III alkyl sources for the elemental metal sources traditionally used in MBE. Higher wafer throughput results because in VCE, the metal-alkyl sources for Ga, Al, and dopants can be mixed at room temperature and distributed uniformly though a large area injector to multiple substrates as a homogeneous array of mixed element molecular beams. The VCE reactor that we have built and that we shall describe here uniformly deposits films on 7 inch diameter substrate platters. Each platter contains seven two inch or three 3 inch diameter wafers. The load chamber contains up to nine platters. The vacuum chamber is equipped with two VCE growth zones and two arsenic ovens, one per growth zone. Finally, each oven has a 1 kg arsenic capacity. As of this writing, mirror smooth GaAs films have been grown at up to 4 μm/h growth rate on multiple wafers with good thickness uniformity. The background doping is p-type with a typical hole concentration and mobility of 1 × 10 16/cm 3 and 350 cm 2/V·s. This background doping level is low enough for the fabrication of MESFETs, solar cells, and photocathodes as well as other types of devices. We have fabricated MESFET devices using VCE-grown epi wafers with peak extrinsic transconductance as high as 210 mS/mm for a threshold voltage of - 3 V and a 0.6 μm gate length. We have also recently grown AlGaAs epi layers with up to 80% aluminum using TEAl as the aluminum alkyl source. The Al

  7. Low-temperature plasma-deposited silicon epitaxial films: Growth and properties

    SciTech Connect

    Demaurex, Bénédicte; Bartlome, Richard; Seif, Johannes P.; Geissbühler, Jonas; Alexander, Duncan T. L.; Jeangros, Quentin; Ballif, Christophe; De Wolf, Stefaan

    2014-08-05

    Low-temperature (≤ 180 °C) epitaxial growth yields precise thickness, doping, and thermal-budget control, which enables advanced-design semiconductor devices. In this paper, we use plasma-ehanced chemical vapor deposition to grow homo-epitaxial layers and study the different growth modes on crystalline silicon substrates. In particular, we determine the conditions leading to epitaxial growth in light of a model that depends only on the silane concentration in the plasma and the mean free path length of surface adatoms. For such growth, we show that the presence of a persistent defective interface layer between the crystalline silicon substrate and the epitaxial layer stems not only from the growth conditions but also from unintentional contamination of the reactor. As a result of our findings, we determine the plasma conditions to grow high-quality bulk epitaxial films and propose a two-step growth process to obtain device-grade material.

  8. Structure and magnetism of epitaxial rare-earth-transition-metal films

    SciTech Connect

    Fullerton, E.E.; Sowers, C.H.; Pearson, J.P.; Bader, S.D.

    1996-10-01

    Growth of epitaxial transition-metal superlattices; has proven essential in elucidating the role of crystal orientation and structure on magnetic properties such as giant magnetoresistance, interlayer coupling, and magnetic surface anisotropies. Extending these studies to the growth of epitaxial rare earth-transition metal (RE-TM) films and superlattices promises to play an equally important role in exploring and optimizing the properties of hard magnets. For instance, Skomski and Coey predict that a giant energy product (120 MG Oe) is possible in multilayer structures consisting of aligned hard-magnet layers exchanged coupled with soft-phase layers with high magnetization. Epitaxy provides one route to synthesizing such exchange-hardened magnets on controlled length scales. Epitaxial growth also allows the magnetic properties to be tailored by controlling the crystal orientation and the anisotropies of the magnetic layers and holds the possibility of stabilizing metastable phases. This paper describes the epitaxy and magnetic properties for several alloys.

  9. Low-temperature plasma-deposited silicon epitaxial films: Growth and properties

    SciTech Connect

    Demaurex, Bénédicte Bartlome, Richard; Seif, Johannes P.; Geissbühler, Jonas; Ballif, Christophe; De Wolf, Stefaan; Alexander, Duncan T. L.; Jeangros, Quentin

    2014-08-07

    Low-temperature (≤200 °C) epitaxial growth yields precise thickness, doping, and thermal-budget control, which enables advanced-design semiconductor devices. In this paper, we use plasma-enhanced chemical vapor deposition to grow homo-epitaxial layers and study the different growth modes on crystalline silicon substrates. In particular, we determine the conditions leading to epitaxial growth in light of a model that depends only on the silane concentration in the plasma and the mean free path length of surface adatoms. For such growth, we show that the presence of a persistent defective interface layer between the crystalline silicon substrate and the epitaxial layer stems not only from the growth conditions but also from unintentional contamination of the reactor. Based on our findings, we determine the plasma conditions to grow high-quality bulk epitaxial films and propose a two-step growth process to obtain device-grade material.

  10. Perspective: Oxide molecular-beam epitaxy rocks!

    SciTech Connect

    Schlom, Darrell G.

    2015-06-01

    Molecular-beam epitaxy (MBE) is the “gold standard” synthesis technique for preparing semiconductor heterostructures with high purity, high mobility, and exquisite control of layer thickness at the atomic-layer level. Its use for the growth of multicomponent oxides got off to a rocky start 30 yr ago, but in the ensuing decades, it has become the definitive method for the preparation of oxide heterostructures too, particularly when it is desired to explore their intrinsic properties. Examples illustrating the unparalleled achievements of oxide MBE are given; these motivate its expanding use for exploring the potentially revolutionary states of matter possessed by oxide systems.

  11. Epitaxial silicide formation on recoil-implanted substrates

    SciTech Connect

    Hashimoto, Shin; Egashira, Kyoko; Tanaka, Tomoya; Etoh, Ryuji; Hata, Yoshifumi; Tung, R. T.

    2005-01-15

    An epitaxy-on-recoil-implanted-substrate (ERIS) technique is presented. A disordered surface layer, generated by forward recoil implantation of {approx}0.7-3x10{sup 15} cm{sup -2} of oxygen during Ar plasma etching of surface oxide, is shown to facilitate the subsequent epitaxial growth of {approx}25-35-nm-thick CoSi{sub 2} layers on Si(100). The dependence of the epitaxial fraction of the silicide on the recoil-implantation parameters is studied in detail. A reduction in the silicide reaction rate due to recoil-implanted oxygen is shown to be responsible for the observed epitaxial formation, similar to mechanisms previously observed for interlayer-mediated growth techniques. Oxygen is found to remain inside the fully reacted CoSi{sub 2} layer, likely in the form of oxide precipitates. The presence of these oxide precipitates, with only a minor effect on the sheet resistance of the silicide layer, has a surprisingly beneficial effect on the thermal stability of the silicide layers. The agglomeration of ERIS-grown silicide layers on polycrystalline Si is significantly suppressed, likely from a reduced diffusivity due to oxygen in the grain boundaries. The implications of the present technique for the processing of deep submicron devices are discussed.

  12. Molecular beam epitaxial growth of GaP on Si

    NASA Astrophysics Data System (ADS)

    Wright, S. L.; Kroemer, H.; Inada, M.

    1984-04-01

    The molecular beam epitaxial growth of GaP on Si was investigated, with the aim of at least approaching device-quality interfaces. Gallium-primed growth on (211)-oriented substrates yielded layers which were free of antiphase domains, and which were of much higher quality than growths on other orientations. A tentative energy-band lineup is proposed, which is consistent with the electrical data. Heterojunction bipolar transistors were fabricated with emitter injection efficiencies up to 90 percent, in spite of indications that the epitaxial emitter layer was far less heavily doped than the base.

  13. In-situ epitaxial growth of graphene/h-BN van der Waals heterostructures by molecular beam epitaxy.

    PubMed

    Zuo, Zheng; Xu, Zhongguang; Zheng, Renjing; Khanaki, Alireza; Zheng, Jian-Guo; Liu, Jianlin

    2015-01-01

    Van der Waals materials have received a great deal of attention for their exceptional layered structures and exotic properties, which can open up various device applications in nanoelectronics. However, in situ epitaxial growth of dissimilar van der Waals materials remains challenging. Here we demonstrate a solution for fabricating van der Waals heterostructures. Graphene/hexagonal boron nitride (h-BN) heterostructures were synthesized on cobalt substrates by using molecular beam epitaxy. Various characterizations were carried out to evaluate the heterostructures. Wafer-scale heterostructures consisting of single-layer/bilayer graphene and multilayer h-BN were achieved. The mismatch angle between graphene and h-BN is below 1°.

  14. Selective area epitaxy of CdTe

    NASA Astrophysics Data System (ADS)

    Luo, Y. Y.; Cavus, A.; Tamargo, M. C.

    1997-06-01

    We have performed selective area epitaxy (SAE) of CdTe layers grown by molecular beam epitaxy using a shadow mask technique. This technique was chosen over other SAE techniques due to its simplicity and its compatibility with multiple SAE patterning steps. Features as small as 50 microns × 50 microns were obtained with sharp, abrupt side walls and flat mesa tops. Separations between mesas as small as 20 microns were also obtained. Shadowing effects due to the finite thickness of the mask were reduced by placing the CdTe source in a near normal incidence position. Intimate contact between the mask and the substrate was essential in order to achieve good pattern definition.

  15. Wafer bonded epitaxial templates for silicon heterostructures

    NASA Technical Reports Server (NTRS)

    Atwater, Harry A., Jr. (Inventor); Zahler, James M. (Inventor); Morral, Anna Fontcubera I (Inventor)

    2008-01-01

    A heterostructure device layer is epitaxially grown on a virtual substrate, such as an InP/InGaAs/InP double heterostructure. A device substrate and a handle substrate form the virtual substrate. The device substrate is bonded to the handle substrate and is composed of a material suitable for fabrication of optoelectronic devices. The handle substrate is composed of a material suitable for providing mechanical support. The mechanical strength of the device and handle substrates is improved and the device substrate is thinned to leave a single-crystal film on the virtual substrate such as by exfoliation of a device film from the device substrate. An upper portion of the device film exfoliated from the device substrate is removed to provide a smoother and less defect prone surface for an optoelectronic device. A heterostructure is epitaxially grown on the smoothed surface in which an optoelectronic device may be fabricated.

  16. Wafer bonded epitaxial templates for silicon heterostructures

    DOEpatents

    Atwater, Jr., Harry A.; Zahler, James M.; Morral, Anna Fontcubera I

    2008-03-11

    A heterostructure device layer is epitaxially grown on a virtual substrate, such as an InP/InGaAs/InP double heterostructure. A device substrate and a handle substrate form the virtual substrate. The device substrate is bonded to the handle substrate and is composed of a material suitable for fabrication of optoelectronic devices. The handle substrate is composed of a material suitable for providing mechanical support. The mechanical strength of the device and handle substrates is improved and the device substrate is thinned to leave a single-crystal film on the virtual substrate such as by exfoliation of a device film from the device substrate. An upper portion of the device film exfoliated from the device substrate is removed to provide a smoother and less defect prone surface for an optoelectronic device. A heterostructure is epitaxially grown on the smoothed surface in which an optoelectronic device may be fabricated.

  17. Spatially Correlated Disorder in Epitaxial van der Waals Heterostructures

    NASA Astrophysics Data System (ADS)

    Laanait, Nouamane; Zhang, Zhan; Schleputz, Christian; Liu, Ying; Wojcik, Michael; Myers-Ward, Rachael; Gaskill, D. Kurt; Fenter, Paul; Li, Lian

    The structural cohesion of van der Waals (vdW) heterostructures relies upon a cooperative balance between strong intra-layer bonded interactions and weak inter-layer coupling. The confinement of extended defects to within a single vdW layer and competing interactions introduced by epitaxial constraints could generate fundamentally new structural disorders. Here we report on the presence of spatially correlated and localized disorder states that coexist with the near perfect crystallographic order along the growth direction of epitaxial vdW heterostructure of Bi2Se3/graphene/SiC grown by molecular beam epitaxy. With the depth penetration of hard X-ray diffraction microscopy and high-resolution surface scattering, we imaged local structural configurations from the atomic to mesoscopic length scales, and found that these disorder states result as a confluence of atomic scale modulations in the strength of vdW layer-layer interactions and nanoscale boundary conditions imposed by the substrate. These findings reveal a vast landscape of novel disorder states that can be manifested in epitaxial vdW heterostructures. Supported by the Wigner Fellowship program at Oak Ridge Nat'l Lab.

  18. Vacancies in epitaxial graphene

    SciTech Connect

    Davydov, S. Yu.

    2015-08-15

    The coherent-potential method is used to consider the problem of the influence of a finite concentration of randomly arranged vacancies on the density of states of epitaxial graphene. To describe the density of states of the substrate, simple models (the Anderson model, Haldane-Anderson model, and parabolic model) are used. The electronic spectrum of free single-sheet graphene is considered in the low-energy approximation. Charge transfer in the graphene-substrate system is discussed. It is shown that, in all cases, the density of states of epitaxial graphene decreases proportionally to the vacancy concentration. At the same time, the average charge transferred from graphene to the substrate increases.

  19. Epitaxial growth of MgB2 films at ambient temperature

    NASA Astrophysics Data System (ADS)

    Shishido, Hiroaki; Yoshida, Takuya; Nakagami, Takatoshi; Ishida, Takekazu

    We grew crystalline MgB2 thin films using molecular beam epitaxy at a low substrate temperature of 110 °C under an ultrahigh vacuum of about 10-6 Pa. MgB2 thin films were deposited on the (001) surface of a 4H-SiC substrate with an epitaxial Mg buffer layer. The epitaxial growth was confirmed by X-ray diffraction measurements. MgB2 thin films show a sharp superconducting transition at 27.2 K, with a relatively narrow superconducting transition width ΔTc = 0.9 K. The growth temperature was lower than any in prior reports on superconducting MgB2 thin films. The presence of the epitaxial Mg buffer layer is crucial for reducing the epitaxial temperature.

  20. Epitaxial growth of molecular crystals on van der waals substrates for high-performance organic electronics.

    PubMed

    Lee, Chul-Ho; Schiros, Theanne; Santos, Elton J G; Kim, Bumjung; Yager, Kevin G; Kang, Seok Ju; Lee, Sunwoo; Yu, Jaeeun; Watanabe, Kenji; Taniguchi, Takashi; Hone, James; Kaxiras, Efthimios; Nuckolls, Colin; Kim, Philip

    2014-05-01

    Epitaxial van der Waals (vdW) heterostructures of organic and layered materials are demonstrated to create high-performance organic electronic devices. High-quality rubrene films with large single-crystalline domains are grown on h-BN dielectric layers via vdW epitaxy. In addition, high carrier mobility comparable to free-standing single-crystal counterparts is achieved by forming interfacial electrical contacts with graphene electrodes. PMID:24458727

  1. The role of vapour etching in the growth of epitaxial InP

    NASA Astrophysics Data System (ADS)

    Ashen, D. J.; Anderson, D. A.; Apsley, N.; Emeny, M. T.

    1982-12-01

    Undoped single epitaxial layers of InP have been grown by the In-PCI 3-H 2 technique. Hall data, carrier concentration profile and layer surface quality have been studied as a function of pre-growth vapour etching and source saturation conditions. Incomplete vapour etching is shown to lead to layers with low room temperature mobility, large carrier freeze-out between 290 and 77 K, and a large density of defects on the epitaxial layer surface. Carrier concentration profiles through such layers show evidence of a high conductivity region at the interface with the substrate which we suggest is formed by material grown during source saturation. We demonstrate that the growth of high carrier concentration material can take place from an unsaturated source, and we show that a two-layer model accounts quantitatively for the Hall data. These results can be used to specify the appropriate etching conditions to grow epitaxial layers with abrupt interfaces and high mobility.

  2. HgTe-CdTe-InSb heterostructures by molecular beam epitaxy

    SciTech Connect

    Ballingall, J.M.; Leopold, D.J.; Peterman, D.J.

    1985-08-01

    HgTe-CdTe heterostructures have been grown by molecular beam epitaxy on (100) InSb substrates. Separate elemental Hg and Te beams were used for the HgTe growth at a substrate temperature of 160 C. X-ray diffraction measurements indicate that thin epitaxial layers are of high crystalline quality. Secondary-ion mass spectroscopy measurements show substantial In and Sb diffusion into the epitaxial layers with a concentration enhancement at the HgTe-CdTe interface. 9 references.

  3. Epitaxial gallium oxide on a SiC/Si substrate

    NASA Astrophysics Data System (ADS)

    Kukushkin, S. A.; Nikolaev, V. I.; Osipov, A. V.; Osipova, E. V.; Pechnikov, A. I.; Feoktistov, N. A.

    2016-09-01

    Well-textured gallium oxide β-Ga2O3 layers with a thickness of 1 μm and a close to epitaxial layer structure were grown by the method of chloride vapor phase epitaxy on Si(111) wafers with a nano-SiC buffer layer. In order to improve the growth, a high-quality silicon carbide buffer layer 100 nm thick was preliminarily synthesized by the substitution of atoms on the silicon surface. The β-Ga2O3 films were thoroughly investigated using reflection high-energy electron diffraction, ellipsometry, X-ray diffraction, scanning electron microscopy, and micro-Raman spectroscopy. The investigations revealed that the films are textured with a close to epitaxial structure and consist of a pure β-phase Ga2O3 with the (overline 2 01) orientation. The dependence of the dielectric constant of epitaxial β-Ga2O3 on the photon energy ranging from 0.7 to 6.5 eV in the isotropic approximation was measured.

  4. Continuum model of surface roughening and epitaxial breakdown during low-temperature Ge(001) molecular beam epitaxy

    SciTech Connect

    Bratland, K. A.; Spila, T.; Cahill, D. G.; Greene, J. E.; Desjardins, P.

    2011-03-15

    Numerical simulations based on a discrete model describing step edge motion are used to compute the surface morphological evolution of Ge(001) layers deposited by low-temperature (T{sub s} = 45-230 deg. C) molecular beam epitaxy and to probe the relationship between surface roughening and the onset of epitaxial breakdown - the abrupt growth mode transition from epitaxial to amorphous - at temperature-dependent critical film thicknesses h{sub 1}(T{sub s}). Computed surface widths w and in-plane coherence lengths d as a function of layer thickness h exhibit good agreement with experimental values. Inspired by experimental results indicating that epitaxial breakdown is initiated at facetted interisland trenches as the surface roughness reaches a T{sub s}-independent overall aspect ratio, we show that simulated data for w/d = 0.03 correspond to thicknesses h{sub 1{proportional_to}} exp (-E{sub 1}/kT{sub s}) with E{sub 1} = 0.63 eV, a value equal to the Ge adatom diffusion activation energy on Ge(001). Simulated h{sub 1} values agree well with experimental data. Above a critical growth temperature of 170 deg. C, computed w/d values saturate at large film thicknesses, never reaching the critical aspect ratio w/d = 0.03. Thus, the model also predicts that epitaxial breakdown does not occur for T{sub s} > 170 deg. C as observed experimentally.

  5. Growth of Defect-Free 3C-Sic on 4H- and 6H-SIC Mesas Using Step-Free Surface Heteroepitaxy

    NASA Technical Reports Server (NTRS)

    Neudeck, Philip G.; Powell, J. Anthony; Trunek, Andrew J.; Huang, Xianrong R.; Dudley, Michael

    2002-01-01

    A new growth process, herein named step-free surface heteroepitaxy, has achieved 3C-SiC films completely free of double positioning boundaries and stacking faults on 4H-SiC and 6H-SiC substrate mesas. The process is based upon the initial 2-dimensional nucleation and lateral expansion of a single island of 3C-SiC on a 4H- or 6H-SiC mesa surface that is completely free of bilayer surface steps. Our experimental results indicate that substrate-epilayer in-plane lattice mismatch (Delta/a = 0.0854% for 3C/4H) is at least partially relieved parallel to the interface in the initial bilayers of the heterofilm, producing an at least partially relaxed 3C-SiC film without dislocations that undesirably thread through the thickness of the epilayer. This result should enable realization of improved 3C-SiC devices.

  6. Methods of preparing flexible photovoltaic devices using epitaxial liftoff, and preserving the integrity of growth substrates used in epitaxial growth

    SciTech Connect

    Forrest, Stephen R; Zimmerman, Jeramy; Lee, Kyusang; Shiu, Kuen-Ting

    2013-02-19

    There is disclosed methods of making photosensitive devices, such as flexible photovoltaic (PV) devices, through the use of epitaxial liftoff. Also described herein are methods of preparing flexible PV devices comprising a structure having a growth substrate, wherein the selective etching of protective layers yields a smooth growth substrate that us suitable for reuse.

  7. Methods of preparing flexible photovoltaic devices using epitaxial liftoff, and preserving the integrity of growth substrates used in epitaxial growth

    DOEpatents

    Forrest, Stephen R; Zimmerman, Jeramy; Lee, Kyusang; Shiu, Kuen-Ting

    2015-01-06

    There is disclosed methods of making photosensitive devices, such as flexible photovoltaic (PV) devices, through the use of epitaxial liftoff. Also described herein are methods of preparing flexible PV devices comprising a structure having a growth substrate, wherein the selective etching of protective layers yields a smooth growth substrate that us suitable for reuse.

  8. Epitaxial oxide bilayer on Pt (001) nanofacets

    NASA Astrophysics Data System (ADS)

    Hennessy, Daniel; Komanicky, Vladimir; Iddir, Hakim; Pierce, Michael S.; Menzel, Andreas; Chang, Kee-Chul; Barbour, Andi; Zapol, Peter; You, Hoydoo

    2012-01-01

    We observed an epitaxial, air-stable, partially registered (2 × 1) oxide bilayer on Pt (001) nanofacets [V. Komanicky, A. Menzel, K.-C. Chang, and H. You, J. Phys. Chem. 109, 23543 (2005)]. The bilayer is made of two half Pt layers; the top layer has four oxygen bonds and the second layer two. The positions and oxidation states of the Pt atoms are determined by analyzing crystal truncation rods and resonance scattering data. The positions of oxygen atoms are determined by density functional theory (DFT) calculations. Partial registry on the nanofacets and the absence of such registry on the extended Pt (001) surface prepared similarly are explained in DFT calculations by strain relief that can be accommodated only by nanoscale facets.

  9. A molecular beam epitaxy facility for in situ neutron scattering

    SciTech Connect

    Dura, J. A.; LaRock, J.

    2009-07-15

    A molecular beam epitaxy (MBE) facility has been built to enable in situ neutron scattering measurements during growth of epitaxial layers. While retaining the full capabilities of a research MBE chamber, this facility has been optimized for polarized neutron reflectometry measurements. Optimization includes a compact lightweight portable design, a neutron window, controllable magnetic field, deposition across a large 76 mm diameter sample with exceptional flux uniformity, and sample temperatures continuously controllable from 38 to 1375 K. A load lock chamber allows for sample insertion, storage of up to 4 samples, and docking with other facilities. The design and performance of this chamber are described here.

  10. Optical Probing of metamagnetic phases in epitaxial EuSe

    SciTech Connect

    Galgano, G. D.; Henriques, A. B.; Bauer, G.; Springholz, G.

    2011-12-23

    EuSe is a wide gap magnetic semiconductors with a potential for applications in proof-of-concept spintronic devices. When the temperature is lowered, EuSe goes through sharp transitions between a variety of magnetic phases and is thus described as metamagnetic. The purpose of the present investigation is to correlate the magnetic order to the sharp dichroic doublet, discovered recently in high quality thin epitaxial layers of EuSe, grown by molecular beam epitaxy. We report detailed measurements of the doublet positions and intensities as a function of magnetic field in low temperatures, covering several magnetic phases.

  11. Microstructure of Co/X (X=Cu,Ag,Au) epitaxial thin films grown on Al{sub 2}O{sub 3}(0001) substrates

    SciTech Connect

    Ohtake, Mitsuru; Akita, Yuta; Futamoto, Masaaki; Kirino, Fumiyoshi

    2007-05-01

    Epitaxial thin films of Co/X (X=Cu,Ag,Au) were prepared on Al{sub 2}O{sub 3}(0001) substrates at substrate temperatures of 100 and 300 degree sign C by UHV molecular beam epitaxy. A complicated microstructure was realized for the epitaxial thin films. In-situ reflection high-energy electron diffraction observation has shown that X atoms of the buffer layer segregated to the surface during Co layer deposition, and it yielded a unique epitaxial granular structure. The structure consists of small Co grains buried in the X buffer layer, where both the magnetic small Co grains and the nonmagnetic X layer are epitaxially grown on the single crystal substrate. The structure varied depending on the X element and the substrate temperature. The crystal structure of Co grains is influenced by the buffer layer material and determined to be hcp and fcc structures for the buffer layer materials of Au and Cu, respectively.

  12. Growth of Epitaxial Oxide Thin Films on Graphene

    NASA Astrophysics Data System (ADS)

    Zou, Bin; Walker, Clementine; Wang, Kai; Tileli, Vasiliki; Shaforost, Olena; Harrison, Nicholas M.; Klein, Norbert; Alford, Neil M.; Petrov, Peter K.

    2016-08-01

    The transfer process of graphene onto the surface of oxide substrates is well known. However, for many devices, we require high quality oxide thin films on the surface of graphene. This step is not understood. It is not clear why the oxide should adopt the epitaxy of the underlying oxide layer when it is deposited on graphene where there is no lattice match. To date there has been no explanation or suggestion of mechanisms which clarify this step. Here we show a mechanism, supported by first principles simulation and structural characterisation results, for the growth of oxide thin films on graphene. We describe the growth of epitaxial SrTiO3 (STO) thin films on a graphene and show that local defects in the graphene layer (e.g. grain boundaries) act as bridge-pillar spots that enable the epitaxial growth of STO thin films on the surface of the graphene layer. This study, and in particular the suggestion of a mechanism for epitaxial growth of oxides on graphene, offers new directions to exploit the development of oxide/graphene multilayer structures and devices.

  13. Growth of Epitaxial Oxide Thin Films on Graphene

    PubMed Central

    Zou, Bin; Walker, Clementine; Wang, Kai; Tileli, Vasiliki; Shaforost, Olena; Harrison, Nicholas M.; Klein, Norbert; Alford, Neil M.; Petrov, Peter K.

    2016-01-01

    The transfer process of graphene onto the surface of oxide substrates is well known. However, for many devices, we require high quality oxide thin films on the surface of graphene. This step is not understood. It is not clear why the oxide should adopt the epitaxy of the underlying oxide layer when it is deposited on graphene where there is no lattice match. To date there has been no explanation or suggestion of mechanisms which clarify this step. Here we show a mechanism, supported by first principles simulation and structural characterisation results, for the growth of oxide thin films on graphene. We describe the growth of epitaxial SrTiO3 (STO) thin films on a graphene and show that local defects in the graphene layer (e.g. grain boundaries) act as bridge-pillar spots that enable the epitaxial growth of STO thin films on the surface of the graphene layer. This study, and in particular the suggestion of a mechanism for epitaxial growth of oxides on graphene, offers new directions to exploit the development of oxide/graphene multilayer structures and devices. PMID:27515496

  14. Growth of Epitaxial Oxide Thin Films on Graphene.

    PubMed

    Zou, Bin; Walker, Clementine; Wang, Kai; Tileli, Vasiliki; Shaforost, Olena; Harrison, Nicholas M; Klein, Norbert; Alford, Neil M; Petrov, Peter K

    2016-01-01

    The transfer process of graphene onto the surface of oxide substrates is well known. However, for many devices, we require high quality oxide thin films on the surface of graphene. This step is not understood. It is not clear why the oxide should adopt the epitaxy of the underlying oxide layer when it is deposited on graphene where there is no lattice match. To date there has been no explanation or suggestion of mechanisms which clarify this step. Here we show a mechanism, supported by first principles simulation and structural characterisation results, for the growth of oxide thin films on graphene. We describe the growth of epitaxial SrTiO3 (STO) thin films on a graphene and show that local defects in the graphene layer (e.g. grain boundaries) act as bridge-pillar spots that enable the epitaxial growth of STO thin films on the surface of the graphene layer. This study, and in particular the suggestion of a mechanism for epitaxial growth of oxides on graphene, offers new directions to exploit the development of oxide/graphene multilayer structures and devices. PMID:27515496

  15. Epitaxial Ni/VO2 heterostructures on Si (001)

    NASA Astrophysics Data System (ADS)

    Singamaneni, Srinivasa Rao; Foley, Gabrielle; Prater, John; Narayan, Jay

    VO2 is a strongly correlated oxide, undergoes a first order metal-insulator (MIT) well above the room temperature 340K. Previous works have shown that the stress associated with structural changes across MIT, VO2 can produce significant changes in magnetic properties of over layer ferromagnetic films such as Ni. This control of the magnetic properties could be very important to many technological applications. However, the current use of r-sapphire as substrate can be restrictive in the microelectronics industry. The previous works focused their studies on polycrystalline Ni and VO2 films, which do not allow the precise controlling of the associated properties due to poor reproducibility of polycrystalline films. We have investigated the magnetic and electronic properties of Ni/VO2 films when epitaxially integrated on Si (001) by pulsed laser deposition using domain matching epitaxy paradigm. Ni was grown both in nanoscale islands and layered form. The XRD results showed that the Ni, VO2and YSZ layers were grown epitaxially in single out of plane orientations. We found that the hysteresis in resistance vs. temperature curves in VO2 thin films was retained even when it is in close proximity with the Ni layer which helped confirm that VO2 layer preserves its characteristic features, revealed the fingerprint magnetic features of Ni layer. We will present and discuss our comprehensive experimental findings.

  16. Misfit dislocations in epitaxy

    NASA Astrophysics Data System (ADS)

    van der Merwe, Jan H.

    2002-08-01

    This article on epitaxy highlights the following: the definition and some historical milestones; the introduction by Frenkel and Kontorowa (FK) of a truncated Fourier series to model the periodic interaction at crystalline interfaces; the invention by Frank and van der Merwe (FvdM)—using the FK model—of (interfacial) misfit dislocations as an important mechanism in accommodating misfit at epilayer-substrate interfaces; the generalization of the FvdM theory to multilayers; the application of the parabolic model by Jesser and van der Merwe to describe, for growing multilayers and superlattices, the impact of Fourier coefficients in the realization of epitaxial orientations and the stability of modes of misfit accommodation; the involvement of intralayer interaction in the latter—all features that impact on the attainment of perfection in crystallinity of thin films, a property that is so vital in the fabrication of useful uniformly thick epilayers (uniformity being another technological requirement), which also depends on misfit accommodation through the interfacial energy that function strongly in the criterion for growth modes, proposed by Bauer; and the ingenious application of the Volterra model by Matthews and others to describe misfit accommodation by dislocations in growing epilayers.

  17. Localized States Influence Spin Transport in Epitaxial Graphene

    NASA Astrophysics Data System (ADS)

    Maassen, T.; van den Berg, J. J.; Huisman, E. H.; Dijkstra, H.; Fromm, F.; Seyller, T.; van Wees, B. J.

    2013-02-01

    We developed a spin transport model for a diffusive channel with coupled localized states that result in an effective increase of spin precession frequencies and a reduction of spin relaxation times in the system. We apply this model to Hanle spin precession measurements obtained on monolayer epitaxial graphene on SiC(0001). Combined with newly performed measurements on quasi-free-standing monolayer epitaxial graphene on SiC(0001) our analysis shows that the different values for the diffusion coefficient measured in charge and spin transport measurements on monolayer epitaxial graphene on SiC(0001) and the high values for the spin relaxation time can be explained by the influence of localized states arising from the buffer layer at the interface between the graphene and the SiC surface.

  18. Epitaxial Growth of CdTe by H2 Sputtering

    NASA Astrophysics Data System (ADS)

    Nishibayashi, Yoshiki; Tokumitsu, Yoji; Saito, Koji; Imura, Takeshi; Osaka, Yukio

    1988-10-01

    CdTe films can be grown epitaxially on InSb(100) by chemical sputtering in H2. The crystalline quality of the epitaxial layers is improved when the substrate temperatures are in the range of 200 to 250°C at a high rf discharge power of 400 W. In channeling experiments employing Rutherford backscattering spectrometry, the χmin (aligned yield/random yield) in the film prepared at 270°C and 400 W is 9.5%. A lattice strain of 0.05% is obtained from the results of X-ray diffraction. These values show that the crystalline quality of the epitaxial film grown by H2 sputtering is superior to the film grown by Ar sputtering.

  19. Photoluminescence of heterostructures with GaP{sub 1−x}N{sub x} and GaP{sub 1−x−y}N{sub x}As{sub y} layers grown on GaP and Si substrates by molecular-beam epitaxy

    SciTech Connect

    Lazarenko, A. A. Nikitina, E. V.; Sobolev, M. S.; Pirogov, E. V.; Denisov, D. V.; Egorov, A. Yu.

    2015-04-15

    The structural and optical properties of heterostructures containing GaP{sub 1−x}N{sub x} ternary and GaP{sub 1−x−y}N{sub x}As{sub y} quaternary alloy layers are discussed. The heterostructures are grown by molecular-beam epitaxy on GaP and Si substrates. The structures are studied by the high-resolution X-ray diffraction technique and photoluminescence measurements in a wide temperature range from 10 to 300 K. In the low-temperature photoluminescence spectra of the alloys with a low nitrogen fraction (x < 0.007), two clearly resolved narrow lines attributed to the localized states of nitrogen pairs and the phonon replicas of these lines are observed.

  20. Influence of the interfacing with an electrically inhomogeneous bottom electrode on the ferroelectric properties of epitaxial PbTiO3

    SciTech Connect

    Kim, Yunseok; Jesse, Stephen; Morelli, Alessio; Kalinin, Sergei V; Vrejoiu, Ionela

    2013-01-01

    The influence of an electrically inhomogeneous epitaxial bottom layer on the ferroelectric and electrical properties has been explored in epitaxial PbTiO3 (PTO)/La0.7Sr0.3MnO3 (LSMO) submicron structures using atomic force microscopy. The submicron LSMO-dot structures underneath the ferroelectric PTO film allow exploring gradual changes in material properties. The LSMO interfacial layer influences significantly both electrical and ferroelectric properties of the upper PTO layer. The obtained results show that the as-grown polarization state of an epitaxial ferroelectric layer is strongly influenced by the properties of the layer on top of which it is deposited.

  1. Outdiffusion of recombination centers from the substrate into LPE layers - GaAs

    NASA Technical Reports Server (NTRS)

    Jastrzebski, L.; Lagowski, J.; Gatos, H. C.

    1979-01-01

    Experimental results are presented showing that outdiffusion of recombination centers from the GaAs substrate into the epitaxial layer takes place during growth. Such outdiffusion decreases the carrier lifetime in the epitaxial layer to much lower values than the radiative recombination limit. Furthermore, it introduces a lifetime gradient across the epitaxial layer which depends critically on the growth velocity and thermal treatment. High rates of growth (such as those attainable in electroepitaxy) and high cooling rates can minimize the adverse effects of normally available substrates on the epitaxial layers; however, good quality substrates are essential for the consistent growth of device quality layers.

  2. Understanding controls on interfacial wetting at epitaxial graphene: Experiment and Theory

    SciTech Connect

    Zhou, Hua; Ganesh, Panchapakesan; Presser, Volker; Wander, Matthew C; Fenter, Paul; Kent, Paul R; Jiang, Deen; Chialvo, Ariel A; Mcdonough, John; Shuford, Kevin L; Gogotsi, Yury G.

    2012-01-01

    The interaction of interfacial water with graphitic carbon at the atomic scale is studied as a function of the hydrophobicity of epitaxial graphene. High resolution x-ray reflectivity shows that the graphene-water contact angle is controlled by the average graphene thickness, due to the fraction of the film surface expressed as the epitaxial buffer layer whose contact angle (contact angle c = 73 ) is substantially smaller than that of multilayer graphene ( c = 93 ). Classical and ab initio molecular dynamics simulations show that the reduced contact angle of the buffer layer is due to both its epitaxy with the SiC substrate and the presence of interfacial defects. This insight clarifies the relationship between interfacial water structure and hydrophobicity, in general, and suggests new routes to control interface properties of epitaxial graphene.

  3. Understanding controls on interfacial wetting at epitaxial graphene: Experiment and theory

    NASA Astrophysics Data System (ADS)

    Zhou, Hua; Ganesh, P.; Presser, Volker; Wander, Matthew C. F.; Fenter, Paul; Kent, Paul R. C.; Jiang, De-En; Chialvo, Ariel A.; McDonough, John; Shuford, Kevin L.; Gogotsi, Yury

    2012-01-01

    The interaction of interfacial water with graphitic carbon at the atomic scale is studied as a function of the hydrophobicity of epitaxial graphene. High resolution x-ray reflectivity shows that the graphene-water contact angle is controlled by the average graphene thickness, due to the fraction of the film surface expressed as the epitaxial buffer layer whose contact angle (contact angle θc = 73°) is substantially smaller than that of multilayer graphene (θc = 93°). Classical and ab initio molecular dynamics simulations show that the reduced contact angle of the buffer layer is due to both its epitaxy with the SiC substrate and the presence of interfacial defects. This insight clarifies the relationship between interfacial water structure and hydrophobicity, in general, and suggests new routes to control interface properties of epitaxial graphene.

  4. Understanding controls on interfacial wetting at epitaxial graphene: Experiment and Theory

    SciTech Connect

    Kent, Paul R

    2011-01-01

    The interaction of interfacial water with graphitic carbon at the atomic scale is studied as a function of the hydrophobicity of epitaxial graphene. High resolution x-ray reflectivity shows that the graphene-water contact angle is controlled by the average graphene thickness, due to the fraction of the film surface expressed as the epitaxial buffer layer whose contact angle (contact angle {Theta}{sub c} = 73{sup o}) is substantially smaller than that of multilayer graphene ({Theta}{sub c} = 93{sup o}). Classical and ab initio molecular dynamics simulations show that the reduced contact angle of the buffer layer is due to both its epitaxy with the SiC substrate and the presence of interfacial defects. This insight clarifies the relationship between interfacial water structure and hydrophobicity, in general, and suggests new routes to control interface properties of epitaxial graphene.

  5. Epitaxial integration of ferromagnetic correlated oxide LaCoO{sub 3} with Si (100)

    SciTech Connect

    Posadas, A.; Berg, M.; Seo, H.; Lozanne, A. de; Demkov, A. A.; Smith, D. J.; Kirk, A. P.; Zhernokletov, D.; Wallace, R. M.

    2011-01-31

    We have grown epitaxial strained LaCoO{sub 3} on (100)-oriented silicon by molecular beam epitaxy using a relaxed epitaxial SrTiO{sub 3} buffer layer. Superconducting quantum interference device magnetization measurements show that, unlike the bulk material, the ground state of the strained LaCoO{sub 3} on silicon is ferromagnetic with a T{sub C} of 85 K. First principles calculations suggest that a ferromagnetic ground state can be stabilized in LaCoO{sub 3} by a sufficiently large biaxial tensile strain with the transition accompanied by a partial untilting of the CoO{sub 6} octahedra.

  6. Hydrothermal epitaxy of perovskite thin films

    NASA Astrophysics Data System (ADS)

    Chien, Allen T.

    1998-12-01

    This work details the discovery and study of a new process for the growth of epitaxial single crystal thin films which we call hydrothermal epitaxy. Hydrothermal epitaxy is a low temperature solution route for producing heteroepitaxial thin films through the use of solution chemistry and structurally similar substrates. The application of this synthesis route has led to the growth of a variety of epitaxial perovskite (BaTiOsb3, SrTiOsb3, and Pb(Zr,Ti)Osb3 (PZT)) thin films which provides a simple processing pathway for the formation of other materials of technological interest. BaTiOsb3 and PZT heteroepitaxial thin films and powders were produced by the hydrothermal method at 90-200sp°C using various alkali bases. XRD and TEM analysis shows that, in each case, the films and powders form epitaxially with a composition nearly identical to that of the starting precursors. Sequential growth experiments show that film formation initiates by the nucleation of submicron faceted islands at the step edges of the SrTiOsb3 substrates followed by coalescence after longer growth periods. A Ba-rich interfacial layer between the BaTiOsb3 islands and the SrTiOsb3 surface is seen by cross-section TEM during early growth periods. Electrophoretic and Basp{2+} adsorption data provide a chemical basis for the existence of the interfacial layer. Homoepitaxial growth of SrTiOsb3 on SrTiOsb3 also occurs by island growth, suggesting that the growth mode may be a consequence of the aqueous surface chemistry inherent in the process. Film formation is shown to be affected by any number of factors including type of base, pH, temperature, and substrate pretreatments. Different cation bases (Na-, K-, Rb-, Cs-, TMA-OH) demonstrated pronounced changes in powder and film morphology. For example, smaller cation bases (e.g., NaOH, KOH and RbOH) resulted the formation of 1.5 mum \\{100\\} faceted perovskite PbTiOsb3 blocks while larger cation bases (e.g., CsOH and TMA-OH) produced 500 nm sized

  7. Pinhole-free growth of epitaxial CoSi.sub.2 film on Si(111)

    NASA Technical Reports Server (NTRS)

    Lin, True-Lon (Inventor); Fathauer, Robert W. (Inventor); Grunthaner, Paula J. (Inventor)

    1991-01-01

    Pinhole-free epitaxial CoSi.sub.2 films (14') are fabricated on (111)-oriented silicon substrates (10) with a modified solid phase epitaxy technique which utilizes (1) room temperature stoichiometric (1:2) codeposition of Co and Si followed by (2) room temperature deposition of an amorphous silicon capping layer (16), and (3) in situ annealing at a temperature ranging from about 500.degree. to 750.degree. C.

  8. Suppression of planar defects in the molecular beam epitaxy of GaAs/ErAs/GaAs heterostructures

    SciTech Connect

    Crook, Adam M.; Nair, Hari P.; Ferrer, Domingo A.; Bank, Seth R.

    2011-08-15

    We present a growth method that overcomes the mismatch in rotational symmetry of ErAs and conventional III-V semiconductors, allowing for epitaxially integrated semimetal/semiconductor heterostructures. Transmission electron microscopy and reflection high-energy electron diffraction reveal defect-free overgrowth of ErAs layers, consisting of >2x the total amount of ErAs that can be embedded with conventional layer-by-layer growth methods. We utilize epitaxial ErAs nanoparticles, overgrown with GaAs, as a seed to grow full films of ErAs. Growth proceeds by diffusion of erbium atoms through the GaAs spacer, which remains registered to the underlying substrate, preventing planar defect formation during subsequent GaAs growth. This growth method is promising for metal/semiconductor heterostructures that serve as embedded Ohmic contacts to epitaxial layers and epitaxially integrated active plasmonic devices.

  9. Determination of the position of the. pi. -. nu. -junction in epitaxial structures of gallium arsenide doped with iron

    SciTech Connect

    Chernov, N.A.; Asanov, O.M.; Bakin, N.N.; Vilisova, M.D.

    1984-05-01

    An investigation of the distribution of the electrolyte-semiconductor capacitance barrier over the thickness of epitaxial layers of gallium arsenide doped with iron on a low-resistance substrate is described. It is shown that measurements of the barrier capacitance at low frequencies enables the position of the ..pi..-..nu..-junction, formed at the boundary of separation of the epitaxial layer and the substrate, to be accurately determined.

  10. Multifunctional epitaxial systems on silicon substrates

    NASA Astrophysics Data System (ADS)

    Singamaneni, Srinivasa Rao; Prater, John Thomas; Narayan, Jagdish

    2016-09-01

    Multifunctional heterostructures can exhibit a wide range of functional properties, including colossal magneto-resistance, magnetocaloric, and multiferroic behavior, and can display interesting physical phenomena including spin and charge ordering and strong spin-orbit coupling. However, putting this functionality to work remains a challenge. To date, most of the work reported in the literature has dealt with heterostructures deposited onto closely lattice matched insulating substrates such as DyScO3, SrTiO3 (STO), or STO buffered Si(100) using concepts of lattice matching epitaxy (LME). However, strain in heterostructures grown by LME is typically not fully relaxed and the layers contain detrimental defects such as threading dislocations that can significantly degrade the physical properties of the films and adversely affect the device characteristics. In addition, most of the substrates are incompatible with existing CMOS-based technology, where Si (100) substrates dominate. This review discusses recent advances in the integration of multifunctional oxide and non-oxide materials onto silicon substrates. An alternative thin film growth approach, called "domain matching epitaxy," is presented which identifies approaches for minimizing lattice strain and unwanted defects in large misfit systems (7%-25% and higher). This approach broadly allows for the integration of multifunctional materials onto silicon substrates, such that sensing, computation, and response functions can be combined to produce next generation "smart" devices. In general, pulsed laser deposition has been used to epitaxially grow these materials, although the concepts developed here can be extended to other deposition techniques, as well. It will be shown that TiN and yttria-stabilized zirconia template layers provide promising platforms for the integration of new functionality into silicon-based computer chips. This review paper reports on a number of thin-film heterostructure systems that span a

  11. Molecular beam epitaxy and metalorganic chemical vapor deposition growth of epitaxial CdTe on (100) GaAs/Si and (111) GaAs/Si substrates

    NASA Technical Reports Server (NTRS)

    Nouhi, A.; Radhakrishnan, G.; Katz, J.; Koliwad, K.

    1988-01-01

    Epitaxial CdTe has been grown on both (100)GaAs/Si and (111)GaAs/Si substrates. A combination of molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MOCVD) has been employed for the first time to achieve this growth: the GaAs layers are grown on Si substrates by MBE and the CdTe film is subsequently deposited on GaAs/Si by MOCVD. The grown layers have been characterized by X-ray diffraction, scanning electron microscopy, and photoluminescence.

  12. Growth and spin-resolved photoemission spectroscopy of the epitaxial α-Al2O3/Fe(110) system

    NASA Astrophysics Data System (ADS)

    Dedkov, Yu. S.; Fonin, M.; Rüdiger, U.; Güntherodt, G.

    2002-09-01

    Electronic and structural properties of epitaxial ultrathin aluminum oxide layers grown on epitaxial Fe(110) films were investigated at room temperature by means of spin-, angle- and energy-resolved photoemission spectroscopy. A spin polarization of -(15±5)% near the Fermi energy EF is found for 1 (ML) of α-Al2O3 on epitaxial Fe(110). This value results from the attenuation of -80% of Fe(110) by the oxide layer thickness and the spin-independent part of the scattering cross section.

  13. Reducing dislocations in semiconductors utilizing repeated thermal cycling during multistage epitaxial growth

    DOEpatents

    Fan, John C. C.; Tsaur, Bor-Yeu; Gale, Ronald P.; Davis, Frances M.

    1986-12-30

    Dislocation densities are reduced in growing semiconductors from the vapor phase by employing a technique of interrupting growth, cooling the layer so far deposited, and then repeating the process until a high quality active top layer is achieved. The method of interrupted growth, coupled with thermal cycling, permits dislocations to be trapped in the initial stages of epitaxial growth.

  14. Reducing dislocations in semiconductors utilizing repeated thermal cycling during multistage epitaxial growth

    DOEpatents

    Fan, John C. C.; Tsaur, Bor-Yeu; Gale, Ronald P.; Davis, Frances M.

    1992-02-25

    Dislocation densities are reduced in growing semiconductors from the vapor phase by employing a technique of interrupting growth, cooling the layer so far deposited, and then repeating the process until a high quality active top layer is achieved. The method of interrupted growth, coupled with thermal cycling, permits dislocations to be trapped in the initial stages of epitaxial growth.

  15. Physical vapour deposition growth and transmission electron microscopy characterization of epitaxial thin metal films on single-crystal Si and Ge substrates

    NASA Astrophysics Data System (ADS)

    Westmacott, K. H.; Hinderberger, S.; Dahmen, U.

    2001-06-01

    Epitaxial fcc, bcc and hcp metal and alloy films were grown in high vacuum by physical vapour deposition at high rate ('flash' deposition) on the (111), (110) and (100) surfaces of Si and Ge at different deposition temperatures. The resulting epitaxial relationships and morphological features of these films were characterized by transmission electron microscopy and diffraction. Simple epitaxial relationships were found mainly for the fcc metals that form binary eutectic systems with Si and G e. Of these, Ag exhibited exceptional behaviour by forming in a single crystal cube-cube relationship on all six semiconductor surfaces. Al and Au both formed bicrystal films on (100) substrates but differed in their behaviours on (111) substrates. Silicide formers such as the fcc metals Cu and Ni, as well as all bcc and hcp metals investigated, did not adopt epitaxial relationships on most semiconductor substrates. However, epitaxial single-crystal, bicrystal and tricrystal films of several metals and alloys could be grown by using a Ag buffer layer. The factors controlling the epitaxial growth of metal films are discussed in the light of the observations and compared with the predictions of established models for epitaxial relationships. It is concluded that epitaxial films can be grown easily if the film forms a simple eutectic or monotectic system with the substrate. The epitaxial relationships of those films depend on crystallographic factors for metal-metal epitaxy and on the substrate surface structure for metal-semiconductor epitaxy.

  16. Epitaxial Fe on free-standing GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Yang, Mingze; Darbandi, Ali; Majumder, Sarmita; Watkins, Simon; Kavanagh, Karen

    2016-07-01

    Epitaxial Fe contacts have been fabricated onto the top half of free-standing, Te-doped GaAs nanowires (NWs) via electrodeposition. Electrical isolation from the substrate via a polymeric layer enabled the measurement of electrical transport through individual wires. Using a fixed probe within a scanning electron microscope, an average metal-semiconductor diode barrier height of 0.69 ± 0.03 eV (ideality factor 1.48 ± 0.02) was found.

  17. Characterization of epitaxially grown films of vanadium oxides

    SciTech Connect

    Rogers, K.D.; Coath, J.A.; Lovell, M.C. , Shrivenham, Swindon, Wiltshire, SN6 8LA, England )

    1991-08-01

    The growth of VO{sub 2} and V{sub 2}O{sub 3} thin films by reactive sputtering has been investigated. Previously reported studies of such thin films have often presented ambiguous results concerning the precise nature of the layers produced. A thorough and comprehensive characterization program including x-ray diffraction, scanning electron microscopy, Rutherford-backscattering spectroscopy, and electrical conductivity measurements has been undertaken to ensure that the films produced were of a true epitaxial nature.

  18. The Controller Synthesis of Metastable Oxides Utilizing Epitaxy and Epitaxial Stabilization

    SciTech Connect

    Schlom, Darrell

    2003-12-02

    Molecular beam epitaxy (MBE) has achieved unparalleled control in the integration of semiconductors at the nanometer. These advances were made through the use of epitaxy, epitaxial stabilization, and a combination of composition-control techniques including adsorption-controlled growth and RHEED-based composition control that we have developed, understood, and utilized for the growth of oxides. Also key was extensive characterization (utilizing RHEED, four-circle x-ray diffraction, AFM, TEM, and electrical characterization techniques) in order to study growth modes, optimize growth conditions, and probe the structural, dielectric, and ferroelectric properties of the materials grown. The materials that we have successfully engineered include titanates (PbTiO3, Bi4Ti3O12), tantalates (SrBi2Ta2O9), and niobates (SrBi2Nb2O9); layered combinations of these perovskite-related materials (Bi4Ti3O12-SrTiO3 and Bi4Ti3O12-PbTiO3 Aurivillius phases and metastable PbTiO3/SrTiO3 and BaTiO3/SrTiO3 superlattices), and new metastable phases (Srn+1TinO3n+1 Ruddlesden-Popper phases). The films were grown by reactive MBE and pulsed laser deposition (PLD). Many of these materials are either new or have been synthesized with the highest perfection ever reported. The controlled synthesis of such layered oxide heterostructures offers great potential for tailoring the superconducting, ferroelectric, and dielectric properties of these materials. These properties are important for energy technologies.

  19. Electronic cooling via interlayer Coulomb coupling in multilayer epitaxial graphene

    PubMed Central

    Mihnev, Momchil T.; Tolsma, John R.; Divin, Charles J.; Sun, Dong; Asgari, Reza; Polini, Marco; Berger, Claire; de Heer, Walt A.; MacDonald, Allan H.; Norris, Theodore B.

    2015-01-01

    In van der Waals bonded or rotationally disordered multilayer stacks of two-dimensional (2D) materials, the electronic states remain tightly confined within individual 2D layers. As a result, electron–phonon interactions occur primarily within layers and interlayer electrical conductivities are low. In addition, strong covalent in-plane intralayer bonding combined with weak van der Waals interlayer bonding results in weak phonon-mediated thermal coupling between the layers. We demonstrate here, however, that Coulomb interactions between electrons in different layers of multilayer epitaxial graphene provide an important mechanism for interlayer thermal transport, even though all electronic states are strongly confined within individual 2D layers. This effect is manifested in the relaxation dynamics of hot carriers in ultrafast time-resolved terahertz spectroscopy. We develop a theory of interlayer Coulomb coupling containing no free parameters that accounts for the experimentally observed trends in hot-carrier dynamics as temperature and the number of layers is varied. PMID:26399955

  20. A new approach to epitaxially grow high-quality GaN films on Si substrates: the combination of MBE and PLD

    PubMed Central

    Wang, Wenliang; Wang, Haiyan; Yang, Weijia; Zhu, Yunnong; Li, Guoqiang

    2016-01-01

    High-quality GaN epitaxial films have been grown on Si substrates with Al buffer layer by the combination of molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) technologies. MBE is used to grow Al buffer layer at first, and then PLD is deployed to grow GaN epitaxial films on the Al buffer layer. The surface morphology, crystalline quality, and interfacial property of as-grown GaN epitaxial films on Si substrates are studied systematically. The as-grown ~300 nm-thick GaN epitaxial films grown at 850 °C with ~30 nm-thick Al buffer layer on Si substrates show high crystalline quality with the full-width at half-maximum (FWHM) for GaN(0002) and GaN(102) X-ray rocking curves of 0.45° and 0.61°, respectively; very flat GaN surface with the root-mean-square surface roughness of 2.5 nm; as well as the sharp and abrupt GaN/AlGaN/Al/Si hetero-interfaces. Furthermore, the corresponding growth mechanism of GaN epitaxial films grown on Si substrates with Al buffer layer by the combination of MBE and PLD is hence studied in depth. This work provides a novel and simple approach for the epitaxial growth of high-quality GaN epitaxial films on Si substrates. PMID:27101930

  1. A new approach to epitaxially grow high-quality GaN films on Si substrates: the combination of MBE and PLD.

    PubMed

    Wang, Wenliang; Wang, Haiyan; Yang, Weijia; Zhu, Yunnong; Li, Guoqiang

    2016-04-22

    High-quality GaN epitaxial films have been grown on Si substrates with Al buffer layer by the combination of molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) technologies. MBE is used to grow Al buffer layer at first, and then PLD is deployed to grow GaN epitaxial films on the Al buffer layer. The surface morphology, crystalline quality, and interfacial property of as-grown GaN epitaxial films on Si substrates are studied systematically. The as-grown ~300 nm-thick GaN epitaxial films grown at 850 °C with ~30 nm-thick Al buffer layer on Si substrates show high crystalline quality with the full-width at half-maximum (FWHM) for GaN(0002) and GaN(102) X-ray rocking curves of 0.45° and 0.61°, respectively; very flat GaN surface with the root-mean-square surface roughness of 2.5 nm; as well as the sharp and abrupt GaN/AlGaN/Al/Si hetero-interfaces. Furthermore, the corresponding growth mechanism of GaN epitaxial films grown on Si substrates with Al buffer layer by the combination of MBE and PLD is hence studied in depth. This work provides a novel and simple approach for the epitaxial growth of high-quality GaN epitaxial films on Si substrates.

  2. Crystallization engineering as a route to epitaxial strain control

    SciTech Connect

    Akbashev, Andrew R.; Plokhikh, Aleksandr V.; Barbash, Dmitri; Lofland, Samuel E.; Spanier, Jonathan E.

    2015-10-01

    The controlled synthesis of epitaxial thin films offers opportunities for tuning their functional properties via enabling or suppressing strain relaxation. Examining differences in the epitaxial crystallization of amorphous oxide films, we report on an alternate, low-temperature route for strain engineering. Thin films of amorphous Bi–Fe–O were grown on (001)SrTiO{sub 3} and (001)LaAlO{sub 3} substrates via atomic layer deposition. In situ X-ray diffraction and X-ray photoelectron spectroscopy studies of the crystallization of the amorphous films into the epitaxial (001)BiFeO{sub 3} phase reveal distinct evolution profiles of crystallinity with temperature. While growth on (001)SrTiO{sub 3} results in a coherently strained film, the same films obtained on (001)LaAlO{sub 3} showed an unstrained, dislocation-rich interface, with an even lower temperature onset of the perovskite phase crystallization than in the case of (001)SrTiO{sub 3}. Our results demonstrate how the strain control in an epitaxial film can be accomplished via its crystallization from the amorphous state.

  3. Principle of direct van der Waals epitaxy of single-crystalline films on epitaxial graphene.

    PubMed

    Kim, Jeehwan; Bayram, Can; Park, Hongsik; Cheng, Cheng-Wei; Dimitrakopoulos, Christos; Ott, John A; Reuter, Kathleen B; Bedell, Stephen W; Sadana, Devendra K

    2014-09-11

    There are numerous studies on the growth of planar films on sp(2)-bonded two-dimensional (2D) layered materials. However, it has been challenging to grow single-crystalline films on 2D materials due to the extremely low surface energy. Recently, buffer-assisted growth of crystalline films on 2D layered materials has been introduced, but the crystalline quality is not comparable with the films grown on sp(3)-bonded three-dimensional materials. Here we demonstrate direct van der Waals epitaxy of high-quality single-crystalline GaN films on epitaxial graphene with low defectivity and surface roughness comparable with that grown on conventional SiC or sapphire substrates. The GaN film is released and transferred onto arbitrary substrates. The post-released graphene/SiC substrate is reused for multiple growth and transfer cycles of GaN films. We demonstrate fully functional blue light-emitting diodes (LEDs) by growing LED stacks on reused graphene/SiC substrates followed by transfer onto plastic tapes.

  4. Principle of direct van der Waals epitaxy of single-crystalline films on epitaxial graphene

    NASA Astrophysics Data System (ADS)

    Kim, Jeehwan; Bayram, Can; Park, Hongsik; Cheng, Cheng-Wei; Dimitrakopoulos, Christos; Ott, John A.; Reuter, Kathleen B.; Bedell, Stephen W.; Sadana, Devendra K.

    2014-09-01

    There are numerous studies on the growth of planar films on sp2-bonded two-dimensional (2D) layered materials. However, it has been challenging to grow single-crystalline films on 2D materials due to the extremely low surface energy. Recently, buffer-assisted growth of crystalline films on 2D layered materials has been introduced, but the crystalline quality is not comparable with the films grown on sp3-bonded three-dimensional materials. Here we demonstrate direct van der Waals epitaxy of high-quality single-crystalline GaN films on epitaxial graphene with low defectivity and surface roughness comparable with that grown on conventional SiC or sapphire substrates. The GaN film is released and transferred onto arbitrary substrates. The post-released graphene/SiC substrate is reused for multiple growth and transfer cycles of GaN films. We demonstrate fully functional blue light-emitting diodes (LEDs) by growing LED stacks on reused graphene/SiC substrates followed by transfer onto plastic tapes.

  5. Liquid-Phase Epitaxial Growth of ZnS, ZnSe and Their Mixed Compounds Using Te as Solvent

    NASA Astrophysics Data System (ADS)

    Nakamura, Hiroshi; Aoki, Masaharu

    1981-01-01

    Epitaxial layers of ZnS, ZnSe and their mixed compounds were grown on ZnS substrates by the liquid-phase epitaxial growth (LPE) method using Te as the solvent. The open-tube slide-boat technique was used, and a suitable starting temperature for growth was found to be 850°C for ZnS and 700-800°C for ZnSe. The ZnS epitaxial layers grown on {111}A and {111}B oriented ZnS substrates were thin (˜1 μm) and smooth, had low, uniform Te concentrations (˜0.1 at.%) and were highly luminescent. The ZnSe epitaxial layers were relatively thick (10-30 μm) and had fairly high Te concentrations (a few at.%). Various mixed compound ZnS1-xSex were also grown on ZnS substrates.

  6. Well-posedness of a two-scale model for liquid phase epitaxy with elasticity

    NASA Astrophysics Data System (ADS)

    Kutter, Michael; Rohde, Christian; Sändig, Anna-Margarete

    2015-08-01

    Epitaxy, a special form of crystal growth, is a technically relevant process for the production of thin films and layers. It can generate microstructures of different morphologies, such as steps, spirals or pyramids. These microstructures are influenced by elastic effects in the epitaxial layer. There are different epitaxial techniques, one being liquid phase epitaxy. Thereby, single particles are deposited out of a supersaturated liquid solution on a substrate where they contribute to the growth process. This article studies a two-scale model including elasticity, introduced in Eck et al. (Eur Phys J Special Topics 177:5-21, 2009) and extended in Eck et al. (2006). It consists of a macroscopic Navier-Stokes system and a macroscopic convection-diffusion equation for the transport of matter in the liquid, and a microscopic problem that combines a phase field approximation of a Burton-Cabrera-Frank model for the evolution of the epitaxial layer, a Stokes system for the fluid flow near the layer and an elasticity system for the elastic deformation of the solid film. Suitable conditions couple the single parts of the model. As the main result, existence and uniqueness of a solution are proven in suitable function spaces. Furthermore, an iterative solving procedure is proposed, which reflects, on the one hand, the strategy of the proof of the main result via fixed point arguments and, on the other hand, can be the basis for a numerical algorithm.

  7. Epitaxial Al2O3 capacitors for low microwave loss superconducting quantum circuits

    NASA Astrophysics Data System (ADS)

    Cho, K.-H.; Patel, U.; Podkaminer, J.; Gao, Y.; Folkman, C. M.; Bark, C. W.; Lee, S.; Zhang, Y.; Pan, X. Q.; McDermott, R.; Eom, C. B.

    2013-10-01

    We have characterized the microwave loss of high-Q parallel plate capacitors fabricated from thin-film Al/Al2O3/Re heterostructures on (0001) Al2O3 substrates. The superconductor-insulator-superconductor trilayers were grown in situ in a hybrid deposition system: the epitaxial Re base and polycrystalline Al counterelectrode layers were grown by sputtering, while the epitaxial Al2O3 layer was grown by pulsed laser deposition. Structural analysis indicates a highly crystalline epitaxial Al2O3 layer and sharp interfaces. The measured intrinsic (low-power, low-temperature) quality factor of the resonators is as high as 3 × 104. These results indicate that low-loss grown Al2O3 is an attractive candidate dielectric for high-fidelity superconducting qubit circuits.

  8. Chemical ordering in magnetic FePd/Pd(001) epitaxial thin films induced by annealing

    SciTech Connect

    Halley, D.; Bayle-Guillemaud, P.; Arenal, R.; Marty, A.; Samson, Y.; Gilles, B.

    2004-11-01

    Chemically disordered FePd epitaxial layers are grown at room temperature by molecular beam epitaxy on a Pd(001) buffer layer and then annealed in order to induce the chemically ordered L1{sub 0} (AuCu I) structure. Contrary to what is observed in the case of ordering during growth above room temperature, the ordered structure appears here with the three possible variants of the L1{sub 0} phase. The ratio of the three different variant volumes is set by the residual epitaxial strain in the layer before annealing. It thus explains that for long annealing times, the long-range order parameter associated with the L1{sub 0} variant with c along the (100) growth direction saturates at a value close to 0.65, and never reaches unity. Magnetic consequences of the ordering are studied.

  9. High rate epitaxy of silicon thick films by medium pressure plasma chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Kambara, M.; Yagi, H.; Sawayanagi, M.; Yoshida, T.

    2006-04-01

    Homoepitaxial silicon thick films have been produced by medium pressure plasma chemical vapor deposition at rates as fast as 60 nm/s and at a temperature of around 700 °C, with a silane gas partial pressure of 4 mTorr. The continuous transition of the film structures from agglomerated to faceted columnar and to epitaxial planar structure was observed with an increase in the plasma power. The calorimetric analysis during deposition has also confirmed that the thermal boundary layer thickness between the plasma and substrate reduced with the increasing power and became comparable to the mean free path of the vapors when epitaxy was achieved at high rates. In addition, the rate for epitaxial growth was observed to increase linearly with silane gas partial pressure. These potentially indicate that less coagulated silicon atom clusters formed in the reduced boundary thickness have contributed effectively to the high rate epitaxial growth.

  10. Effect of Fe coating of nucleation sites on epitaxial growth of Fe oxide nanocrystals on Si substrates

    NASA Astrophysics Data System (ADS)

    Ishibe, Takafumi; Watanabe, Kentaro; Nakamura, Yoshiaki

    2016-08-01

    We studied the effect of Fe coating on the epitaxial growth of Fe3O4 nanocrystals (NCs) over Fe-coated Ge epitaxial nuclei on Si(111). To completely cover Ge nuclei with Fe, some amount of Fe (>8 monolayers) must be deposited. Such covering is a key to epitaxial growth because an Fe coating layer prevents the oxidation of Ge surfaces during Fe3O4 formation, resulting in the epitaxial growth of Fe3O4 on them. This study demonstrates that an appropriate Fe coating of nucleation sites leads to the epitaxial growth of Fe3O4 NCs on Si substrates, indicating the realization of environmentally friendly and low-cost Fe3O4 NCs as the resistance random access memory material.

  11. Conductive layer for biaxially oriented semiconductor film growth

    DOEpatents

    Findikoglu, Alp T.; Matias, Vladimir

    2007-10-30

    A conductive layer for biaxially oriented semiconductor film growth and a thin film semiconductor structure such as, for example, a photodetector, a photovoltaic cell, or a light emitting diode (LED) that includes a crystallographically oriented semiconducting film disposed on the conductive layer. The thin film semiconductor structure includes: a substrate; a first electrode deposited on the substrate; and a semiconducting layer epitaxially deposited on the first electrode. The first electrode includes a template layer deposited on the substrate and a buffer layer epitaxially deposited on the template layer. The template layer includes a first metal nitride that is electrically conductive and has a rock salt crystal structure, and the buffer layer includes a second metal nitride that is electrically conductive. The semiconducting layer is epitaxially deposited on the buffer layer. A method of making such a thin film semiconductor structure is also described.

  12. Ferroelectric switching in epitaxial GeTe films

    SciTech Connect

    Kolobov, A. V. Fons, P.; Tominaga, J.; Kim, D. J.; Gruverman, A.; Giussani, A.; Calarco, R.

    2014-06-01

    In this paper, using a resonance-enhanced piezoresponse force microscopy approach supported by density functional theory computer simulations, we have demonstrated the ferroelectric switching in epitaxial GeTe films. It has been shown that in films with thickness on the order of several nanometers reversible reorientation of polarization occurs due to swapping of the shorter and longer Ge-Te bonds in the interior of the material. It is also hinted that for ultra thin films consisting of just several atomic layers weakly bonded to the substrate, ferroelectric switching may proceed through exchange of Ge and Te planes within individual GeTe layers.

  13. The Optical Properties of a Polished Uranium Surface and its Epitaxial Oxide, and the Rate of Oxide Growth Determined by Spectrophotometry

    SciTech Connect

    Siekhaus, W; Nelson, A

    2005-12-05

    Wide-band reflectrometry and ellipsometry have been used to determine the optical properties n and k of freshly polished uranium and of the epitaxial oxide layer, and also the rate of oxide growth in air. Results for uranium metal as well as for epitaxial oxide are compared with single wavelength ellipsometry literature values.

  14. Precise, Self-Limited Epitaxy of Ultrathin Organic Semiconductors and Heterojunctions Tailored by van der Waals Interactions.

    PubMed

    Wu, Bing; Zhao, Yinghe; Nan, Haiyan; Yang, Ziyi; Zhang, Yuhan; Zhao, Huijuan; He, Daowei; Jiang, Zonglin; Liu, Xiaolong; Li, Yun; Shi, Yi; Ni, Zhenhua; Wang, Jinlan; Xu, Jian-Bin; Wang, Xinran

    2016-06-01

    Precise assembly of semiconductor heterojunctions is the key to realize many optoelectronic devices. By exploiting the strong and tunable van der Waals (vdW) forces between graphene and organic small molecules, we demonstrate layer-by-layer epitaxy of ultrathin organic semiconductors and heterostructures with unprecedented precision with well-defined number of layers and self-limited characteristics. We further demonstrate organic p-n heterojunctions with molecularly flat interface, which exhibit excellent rectifying behavior and photovoltaic responses. The self-limited organic molecular beam epitaxy (SLOMBE) is generically applicable for many layered small-molecule semiconductors and may lead to advanced organic optoelectronic devices beyond bulk heterojunctions.

  15. Understanding controls on interfacial wetting at epitaxial graphene: Experiment and Theory

    SciTech Connect

    Zhou, Hua; Ganesh, Panchapakesan; Presser, Volker; Wander, Matthew C; Fenter, Paul; Kent, Paul R; Jiang, Deen; Chialvo, Ariel A; Mcdonough, John; Shuford, Kevin L; Gogotsi, Yury G.

    2012-01-01

    The interaction of water with graphitic carbon at the atomic scale is studied as a function of the hydrophobicity of epitaxial graphene. High resolution X-ray reflectivity combined with both classical and ab initio molecular dynamics simulations allows us to understand how the graphene-water interface changes as the hydrophobicity of intrinsic multilayer graphene (contact angle c = 93 ) is reduced by the presence of substrate and surface defect sites, leading to increased hydrophilicity ( c = 73 ) for zero-layer graphene (i.e., the epitaxial buffer layer). The relationship between water depletion and hydrophobicity (i.e., the hydrophobic gap) is also clarified by the current findings.

  16. On the modes of evaporation of Si and dopants in vacuum epitaxy procedures

    SciTech Connect

    Kuznetsov, V. P. Alyabina, N. A.; Bozhenkin, V. A.; Belova, O. V.; Kuznetsov, M. V.

    2008-03-15

    Silicon layers are grown by sublimation molecular beam epitaxy at the rate 1 {mu}m h{sup -1} at temperatures 500-900 Degree-Sign C in vacuum at the pressure 10{sup -5} Pa. The possibility of varying the Sb concentration in the Si layers in the range from 10{sup 15} to 10{sup 20} cm{sup -3} by varying the temperature of epitaxy is shown. The potentialities of different modes of vacuum evaporation of Si and dopants are analyzed.

  17. Optimization of the epitaxial design of high current density resonant tunneling diodes for terahertz emitters

    NASA Astrophysics Data System (ADS)

    Baba, Razvan; Stevens, Benjamin J.; Mukai, Toshikazu; Hogg, Richard A.

    2016-02-01

    We discuss the numerical simulation of high current density InGaAs/AlAs/InP resonant tunneling diodes with a view to their optimization for application as THz emitters. We introduce a figure of merit based upon the ratio of maximum extractable THz power and the electrical power developed in the chip. The aim being to develop high efficiency emitters as output power is presently limited by catastrophic failure. A description of the interplay of key parameters follows, with constraints on strained layer epitaxy introduced. We propose an optimized structure utilizing thin barriers paired with a comparatively wide quantum well that satisfies strained layer epitaxy constraints.

  18. Terahertz and mid-infrared reflectance of epitaxial graphene

    PubMed Central

    Santos, Cristiane N.; Joucken, Frédéric; De Sousa Meneses, Domingos; Echegut, Patrick; Campos-Delgado, Jessica; Louette, Pierre; Raskin, Jean-Pierre; Hackens, Benoit

    2016-01-01

    Graphene has emerged as a promising material for infrared (IR) photodetectors and plasmonics. In this context, wafer scale epitaxial graphene on SiC is of great interest in a variety of applications in optics and nanoelectronics. Here we present IR reflectance spectroscopy of graphene grown epitaxially on the C-face of 6H-SiC over a broad optical range, from terahertz (THz) to mid-infrared (MIR). Contrary to the transmittance, reflectance measurements are not hampered by the transmission window of the substrate, and in particular by the SiC Reststrahlen band in the MIR. This allows us to present IR reflectance data exhibiting a continuous evolution from the regime of intraband to interband charge carrier transitions. A consistent and simultaneous analysis of the contributions from both transitions to the optical response yields precise information on the carrier dynamics and the number of layers. The properties of the graphene layers derived from IR reflection spectroscopy are corroborated by other techniques (micro-Raman and X-ray photoelectron spectroscopies, transport measurements). Moreover, we also present MIR microscopy mapping, showing that spatially-resolved information can be gathered, giving indications on the sample homogeneity. Our work paves the way for a still scarcely explored field of epitaxial graphene-based THz and MIR optical devices. PMID:27102827

  19. Terahertz and mid-infrared reflectance of epitaxial graphene

    NASA Astrophysics Data System (ADS)

    Santos, Cristiane N.; Joucken, Frédéric; de Sousa Meneses, Domingos; Echegut, Patrick; Campos-Delgado, Jessica; Louette, Pierre; Raskin, Jean-Pierre; Hackens, Benoit

    2016-04-01

    Graphene has emerged as a promising material for infrared (IR) photodetectors and plasmonics. In this context, wafer scale epitaxial graphene on SiC is of great interest in a variety of applications in optics and nanoelectronics. Here we present IR reflectance spectroscopy of graphene grown epitaxially on the C-face of 6H-SiC over a broad optical range, from terahertz (THz) to mid-infrared (MIR). Contrary to the transmittance, reflectance measurements are not hampered by the transmission window of the substrate, and in particular by the SiC Reststrahlen band in the MIR. This allows us to present IR reflectance data exhibiting a continuous evolution from the regime of intraband to interband charge carrier transitions. A consistent and simultaneous analysis of the contributions from both transitions to the optical response yields precise information on the carrier dynamics and the number of layers. The properties of the graphene layers derived from IR reflection spectroscopy are corroborated by other techniques (micro-Raman and X-ray photoelectron spectroscopies, transport measurements). Moreover, we also present MIR microscopy mapping, showing that spatially-resolved information can be gathered, giving indications on the sample homogeneity. Our work paves the way for a still scarcely explored field of epitaxial graphene-based THz and MIR optical devices.

  20. Processing and characterization of epitaxial GaAs radiation detectors

    NASA Astrophysics Data System (ADS)

    Wu, X.; Peltola, T.; Arsenovich, T.; Gädda, A.; Härkönen, J.; Junkes, A.; Karadzhinova, A.; Kostamo, P.; Lipsanen, H.; Luukka, P.; Mattila, M.; Nenonen, S.; Riekkinen, T.; Tuominen, E.; Winkler, A.

    2015-10-01

    GaAs devices have relatively high atomic numbers (Z=31, 33) and thus extend the X-ray absorption edge beyond that of Si (Z=14) devices. In this study, radiation detectors were processed on GaAs substrates with 110 - 130 μm thick epitaxial absorption volume. Thick undoped and heavily doped p+ epitaxial layers were grown using a custom-made horizontal Chloride Vapor Phase Epitaxy (CVPE) reactor, the growth rate of which was about 10 μm / h. The GaAs p+/i/n+ detectors were characterized by Capacitance Voltage (CV), Current Voltage (IV), Transient Current Technique (TCT) and Deep Level Transient Spectroscopy (DLTS) measurements. The full depletion voltage (Vfd) of the detectors with 110 μm epi-layer thickness is in the range of 8-15 V and the leakage current density is about 10 nA/cm2. The signal transit time determined by TCT is about 5 ns when the bias voltage is well above the value that produces the peak saturation drift velocity of electrons in GaAs at a given thickness. Numerical simulations with an appropriate defect model agree with the experimental results.

  1. Cantilever epitaxial process

    DOEpatents

    Ashby, Carol I.; Follstaedt, David M.; Mitchell, Christine C.; Han, Jung

    2003-07-29

    A process of growing a material on a substrate, particularly growing a Group II-VI or Group III-V material, by a vapor-phase growth technique where the growth process eliminates the need for utilization of a mask or removal of the substrate from the reactor at any time during the processing. A nucleation layer is first grown upon which a middle layer is grown to provide surfaces for subsequent lateral cantilever growth. The lateral growth rate is controlled by altering the reactor temperature, pressure, reactant concentrations or reactant flow rates. Semiconductor materials, such as GaN, can be produced with dislocation densities less than 10.sup.7 /cm.sup.2.

  2. Methods for making thin layers of crystalline materials

    SciTech Connect

    Lagally, Max G; Paskiewicz, Deborah M; Tanto, Boy

    2013-07-23

    Methods for making growth templates for the epitaxial growth of compound semiconductors and other materials are provided. The growth templates are thin layers of single-crystalline materials that are themselves grown epitaxially on a substrate that includes a thin layer of sacrificial material. The thin layer of sacrificial material, which creates a coherent strain in the single-crystalline material as it is grown thereon, includes one or more suspended sections and one or more supported sections.

  3. Effects of high source flow and high pumping speed on gas source molecular beam epitaxy / chemical beam epitaxy

    NASA Astrophysics Data System (ADS)

    McCollum, M. J.; Jackson, S. L.; Szafranek, I.; Stillman, G. E.

    1990-10-01

    We report the growth of GaAs by molecular beam epitaxy (MBE), gas source molecular beam epitaxy (GSMBE), and chemical beam epitaxy (CBE) in an epitaxial III-V reactor which features high pumping speed. The system is comprised of a modified Perkin-Elmer 430P molecular beam epitaxy system and a custom gas source panel from Emcore. The growth chamber is pumped with a 7000 1/s (He) diffusion pump (Varian VHS-10 with Monsanto Santovac 5 oil). The gas source panel includes pressure based flow controllers (MKS 1150) allowing triethylaluminum (TEA), triethylgallium (TEG), and trimethylindium (TMI) to be supplied without the use of hydrogen. All source lines, including arsine and phosphine, are maintained below atmospheric pressure. The high pumping speed allows total system flow rates as high as 100 SCCM and V/III ratios as high as 100. The purity of GaAs grown by MBE in this system increases with pumping speed. GaAs layers grown by GSMBE with arsine flows of 10 and 20 SCCM have electron concentrations of 1 × 10 15 cm -3 (μ 77=48,000 cm 2/V·) and 2 × 10 14 cm -3 (μ 77=78,000 cm 2/V·s) respectively. El ectron concentration varies with hydride injector temperature such that the minimum in electron concentration occurs for less than complete cracking. The effect of V/III ratio and the use of a metal eutectic bubbler on residual carrier concentration in GaAs grown by CBE is presented. Intentional Si and Be doping of CBE grown GaAs is demonstrated at a high growth rate of 5.4 μm/h.

  4. Organometallic vapor phase epitaxial growth of GaN on ZrN /AlN/Si substrates

    NASA Astrophysics Data System (ADS)

    Oliver, Mark H.; Schroeder, Jeremy L.; Ewoldt, David A.; Wildeson, Isaac H.; Rawat, Vijay; Colby, Robert; Cantwell, Patrick R.; Stach, Eric A.; Sands, Timothy D.

    2008-07-01

    An intermediate ZrN /AlN layer stack that enables the epitaxial growth of GaN on (111) silicon substrates using conventional organometallic vapor phase epitaxy at substrate temperatures of ˜1000°C is reported. The epitaxial (111) ZrN layer provides an integral back reflector and Ohmic contact to n-type GaN, whereas the (0001) AlN layer serves as a reaction barrier, as a thermally conductive interface layer, and as an electrical isolation layer. Smooth (0001) GaN films less than 1μm thick grown on ZrN /AlN/Si yield 0002 x-ray rocking curve full width at half maximum values as low as 1230arcsec.

  5. Low-temperature plasma-deposited silicon epitaxial films: Growth and properties

    DOE PAGES

    Demaurex, Bénédicte; Bartlome, Richard; Seif, Johannes P.; Geissbühler, Jonas; Alexander, Duncan T. L.; Jeangros, Quentin; Ballif, Christophe; De Wolf, Stefaan

    2014-08-05

    Low-temperature (≤ 180 °C) epitaxial growth yields precise thickness, doping, and thermal-budget control, which enables advanced-design semiconductor devices. In this paper, we use plasma-ehanced chemical vapor deposition to grow homo-epitaxial layers and study the different growth modes on crystalline silicon substrates. In particular, we determine the conditions leading to epitaxial growth in light of a model that depends only on the silane concentration in the plasma and the mean free path length of surface adatoms. For such growth, we show that the presence of a persistent defective interface layer between the crystalline silicon substrate and the epitaxial layer stems notmore » only from the growth conditions but also from unintentional contamination of the reactor. As a result of our findings, we determine the plasma conditions to grow high-quality bulk epitaxial films and propose a two-step growth process to obtain device-grade material.« less

  6. Mechanisms of growth and defect properties of epitaxial SiC

    NASA Astrophysics Data System (ADS)

    La Via, F.; Camarda, M.; La Magna, A.

    2014-09-01

    In the last ten years, large improvements in the epitaxial silicon carbide processes have been made. The introduction of chloride precursors, the epitaxial growth on large area substrate with low defect density, the improvement of the surface morphology, the understanding of the chemical vapour deposition (CVD) reactions, and epitaxial mechanisms by advanced simulations are just the main results obtained in the homo-epitaxy process of 4H-SiC. After this large stride in the process of SiC epitaxial growth, it is time to collect this knowledge in a review that can be a reference point for the future work in this interesting field. The structure of the review is the following. After an introduction on the evolution and history of the epitaxial growth of 4H-SiC, the main physics parameter of this epitaxial growth process is explained in detail using the traditional Burton-Cabrera-Franck theory and the experimental observations of the surface instability due to the off-axis growths. Then the introduction of chlorinated precursors in the epitaxial process is reviewed and the effect of this new process on Schottky diodes characteristics is shown. The improvement of the epitaxy process is strictly related to the improvement of the simulation of the growth that helps the researchers to understand the effect of different parameters on such complex system. Then, a large part of the review is devoted to the simulations of the CVD systems, the reaction in the gas phase of the different precursors and the surface reaction models. Also, some important results obtained by Monte Carlo simulation on the study of different growth parameters that influence the formation of defects and their evolution are reported. Finally, the influence of different process parameters and in particular of the growth rate on the formation or the reduction of the principal defects that are observed in the epitaxial layer is reviewed. We have divided these defects in four categories: 3D defects (epi

  7. Chemical solution seed layer for rabits tapes

    SciTech Connect

    Goyal, Amit; Paranthaman, Mariappan; Wee, Sung-Hun

    2014-06-10

    A method for making a superconducting article includes the steps of providing a biaxially textured substrate. A seed layer is then deposited. The seed layer includes a double perovskite of the formula A.sub.2B'B''O.sub.6, where A is rare earth or alkaline earth metal and B' and B'' are different rare earth or transition metal cations. A superconductor layer is grown epitaxially such that the superconductor layer is supported by the seed layer.

  8. Magnetism and epitaxy in Lu/Dy/Lu trilayers

    NASA Astrophysics Data System (ADS)

    Beach, R. S.; Matheny, A.; Salamon, M. B.; Flynn, C. P.; Borchers, J. A.; Erwin, R. W.; Rhyne, J. J.

    1993-05-01

    Thin dysprosium c-axis films (40-400 Å) were grown coherently between 500-Å lutetium layers by molecular beam epitaxy. Bulk magnetization measurements show that these sandwich structures order magnetically at TN≂178 K (=TN of elemental Dy) and undergo ferromagnetic transitions at temperatures which range from 100 K (400 Å Dy) to 175 K (40 Å Dy), significantly enhanced from the bulk TC=85 K. The Dy basal plane lattice parameters in the films were determined by room-temperature x-ray diffraction. We observe a change in these values that correlates with the rise in TC, which suggests that this rise is due to epitaxial strain. The relatively small low-temperature magnetic susceptibility displayed by these samples indicates the presence of a large anisotropy in the basal plane. We address both the issues of the susceptibility and the high ferromagnetic transition temperature.

  9. Growth and properties of epitaxial GdN

    SciTech Connect

    Ludbrook, B. M.; Kuebel, M.; Ruck, B. J.; Preston, A. R. H.; Trodahl, H. J.; Farrell, I. L.; Reeves, R. J.; Durbin, S. M.; Ranno, L.

    2009-09-15

    Epitaxial gadolinium nitride films with well-oriented crystallites of up to 30 nm have been grown on yttria-stabilized zirconia substrates using a plasma-assisted pulsed laser deposition technique. We observe that the epitaxial GdN growth proceeds on top of a gadolinium oxide buffer layer that forms via reaction between deposited Gd and mobile oxygen from the substrate. Hall effect measurements show the films are electron doped to degeneracy, with carrier concentrations of 4x10{sup 20} cm{sup -3}. Magnetic measurements establish a T{sub C} of 70 K with a coercive field that can be tuned from 200 Oe to as low as 10 Oe.

  10. Method of fabricating low-dislocation-density epitaxially-grown films with textured surfaces

    DOEpatents

    Li, Qiming; Wang, George T

    2015-01-13

    A method for forming a surface-textured single-crystal film layer by growing the film atop a layer of microparticles on a substrate and subsequently selectively etching away the microparticles to release the surface-textured single-crystal film layer from the substrate. This method is applicable to a very wide variety of substrates and films. In some embodiments, the film is an epitaxial film that has been grown in crystallographic alignment with respect to a crystalline substrate.

  11. Raman spectra of epitaxial graphene on SiC and of epitaxial graphene transferred to SiO2.

    PubMed

    Lee, Dong Su; Riedl, Christian; Krauss, Benjamin; von Klitzing, Klaus; Starke, Ulrich; Smet, Jurgen H

    2008-12-01

    Raman spectra were measured for mono-, bi-, and trilayer graphene grown on SiC by solid state graphitization, whereby the number of layers was preassigned by angle-resolved ultraviolet photoemission spectroscopy. It was found that the only unambiguous fingerprint in Raman spectroscopy to identify the number of layers for graphene on SiC(0001) is the line width of the 2D (or D*) peak. The Raman spectra of epitaxial graphene show significant differences as compared to micromechanically cleaved graphene obtained from highly oriented pyrolytic graphite crystals. The G peak is found to be blue-shifted. The 2D peak does not exhibit any obvious shoulder structures, but it is much broader and almost resembles a single-peak even for multilayers. Flakes of epitaxial graphene were transferred from SiC onto SiO2 for further Raman studies. A comparison of the Raman data obtained for graphene on SiC with data for epitaxial graphene transferred to SiO2 reveals that the G peak blue-shift is clearly due to the SiC substrate. The broadened 2D peak however stems from the graphene structure itself and not from the substrate.

  12. Effect of growth temperature on defects in epitaxial GaN film grown by plasma assisted molecular beam epitaxy

    SciTech Connect

    Kushvaha, S. S. Pal, P.; Shukla, A. K.; Joshi, Amish G.; Gupta, Govind; Kumar, M.; Singh, S.; Gupta, Bipin K.; Haranath, D.

    2014-02-15

    We report the effect of growth temperature on defect states of GaN epitaxial layers grown on 3.5 μm thick GaN epi-layer on sapphire (0001) substrates using plasma assisted molecular beam epitaxy. The GaN samples grown at three different substrate temperatures at 730, 740 and 750 °C were characterized using atomic force microscopy and photoluminescence spectroscopy. The atomic force microscopy images of these samples show the presence of small surface and large hexagonal pits on the GaN film surfaces. The surface defect density of high temperature grown sample is smaller (4.0 × 10{sup 8} cm{sup −2} at 750 °C) than that of the low temperature grown sample (1.1 × 10{sup 9} cm{sup −2} at 730 °C). A correlation between growth temperature and concentration of deep centre defect states from photoluminescence spectra is also presented. The GaN film grown at 750 °C exhibits the lowest defect concentration which confirms that the growth temperature strongly influences the surface morphology and affects the optical properties of the GaN epitaxial films.

  13. Dislocation reduction of InAs nanofins prepared on Si substrate using metal-organic vapor-phase epitaxy

    PubMed Central

    2012-01-01

    InAs nanofins were prepared on a nanopatterned Si (001) substrate by metal-organic vapor-phase epitaxy. The threading dislocations, stacked on the lowest-energy-facet plane {111}, move along the SiO2 walls, resulting in a dislocation reduction, as confirmed by transmission electron microscopy. The dislocations were trapped within a thin InAs epilayer. The obtained 90-nm-wide InAs nanofins with an almost etching-pit-free surface do not require complex intermediate-layer epitaxial growth processes and large thickness typically required for conventional epitaxial growth. PMID:23176442

  14. Development of molecular beam epitaxy technology for III–V compound semiconductor heterostructure devices

    SciTech Connect

    Cheng, K. Y.

    2013-09-15

    Molecular beam epitaxy (MBE) is a versatile ultrahigh vacuum technique for growing multiple epitaxial layers of semiconductor crystals with high precision. The extreme control of the MBE technique over composition variation, interface sharpness, impurity doping profiles, and epitaxial layer thickness to the atomic level makes it possible to demonstrate a wide variety of novel semiconductor structures. Since its invention nearly 40 years ago, the MBE technique has evolved from a laboratory apparatus for exploring new materials and novel devices to a favored tool for the mass production of III–V high-speed devices. This paper will review some of the past developments in this technology and propose an outlook of future developments.

  15. Van der Waals epitaxy of functional MoO2 film on mica for flexible electronics

    NASA Astrophysics Data System (ADS)

    Ma, Chun-Hao; Lin, Jheng-Cyuan; Liu, Heng-Jui; Do, Thi Hien; Zhu, Yuan-Min; Ha, Thai Duy; Zhan, Qian; Juang, Jenh-Yih; He, Qing; Arenholz, Elke; Chiu, Po-Wen; Chu, Ying-Hao

    2016-06-01

    Flexible electronics have a great potential to impact consumer electronics and with that our daily life. Currently, no direct growth of epitaxial functional oxides on commercially available flexible substrates is possible. In this study, in order to address this challenge, muscovite, a common layered oxide, is used as a flexible substrate that is chemically similar to typical functional oxides. We fabricated epitaxial MoO2 films on muscovite via pulsed laser deposition technique. A combination of X-ray diffraction and transmission electron microscopy confirms van der Waals epitaxy of the heterostructures. The electrical transport properties of MoO2 films are similar to those of the bulk. Flexible or free-standing MoO2 thin film can be obtained and serve as a template to integrate additional functional oxide layers. Our study demonstrates a remarkable concept to create flexible electronics based on functional oxides.

  16. Features of impurity photoconductivity in Si:Er/Si epitaxial diodes

    SciTech Connect

    Antonov, A. V.; Kudryavtsev, K. E. Shengurov, D. V.; Shmagin, V. B.; Krasilnik, Z. F.

    2013-11-15

    The photocurrent spectra of Si:Er/Si epitaxial diode structures are studied. It is shown that the nature of the sub-band-gap photoresponse is determined by the epitaxial growth temperature of the Si:Er layer and is not related to the composition of erbium emission centers. It is found that the absorption of light with photon energies lower than the energy-gap of silicon is determined by impurity-defect complexes that appear during the growth of the epitaxial layer and form a quasi-continuous spectrum of states in the energy gap of silicon. It is assumed that these impurity centers are not related to optically active erbium centers and are not involved in excitation-energy transfer to the rare-earth impurity.

  17. Selective epitaxial growth of graphene on SiC

    SciTech Connect

    Camara, N.; Rius, G.; Godignon, P.; Huntzinger, J.-R.; Tiberj, A.; Camassel, J.

    2008-09-22

    We present a method of selective epitaxial growth of few layers graphene (FLG) on a ''prepatterned'' silicon carbide (SiC) substrate. The methods involves, successively, the sputtering of a thin aluminium nitride (AlN) layer on top of a monocrystalline SiC substrate and, then, patterning it with e-beam lithography and wet etching. The sublimation of few atomic layers of Si from the SiC substrate occurs only through the selectively etched AlN layer. The presence of the Raman G-band at {approx}1582 cm{sup -1} in the AlN-free areas is used to validate the concept. It gives absolute evidence of selective FLG growth.

  18. Selective epitaxial growth of graphene on SiC

    NASA Astrophysics Data System (ADS)

    Camara, N.; Rius, G.; Huntzinger, J.-R.; Tiberj, A.; Mestres, N.; Godignon, P.; Camassel, J.

    2008-09-01

    We present a method of selective epitaxial growth of few layers graphene (FLG) on a "prepatterned" silicon carbide (SiC) substrate. The methods involves, successively, the sputtering of a thin aluminium nitride (AlN) layer on top of a monocrystalline SiC substrate and, then, patterning it with e-beam lithography and wet etching. The sublimation of few atomic layers of Si from the SiC substrate occurs only through the selectively etched AlN layer. The presence of the Raman G-band at ˜1582cm-1 in the AlN-free areas is used to validate the concept. It gives absolute evidence of selective FLG growth.

  19. Oxidation of epitaxial Ce films

    NASA Astrophysics Data System (ADS)

    Vescovo, E.; Carbone, C.

    1996-02-01

    Single-crystal Ce films of more than 300 Å thickness have been epitaxially grown on W(110). Their interaction with molecular oxygen at room temperature has been studied by angle-resolved photoemission, low-energy electron diffraction, and Auger spectroscopy. As a function of the oxygen exposure, the reaction is found to proceed through a sequence of three distinct stages: (i) ordered dissociative surface adsorption; (ii) formation of an ordered Ce2O3-like surface oxide; and (iii) gradual conversion of the sesquioxide into a disordered surface dioxide CeO2-x. A structurally different Ce2O3 oxide is obtained after high oxygen exposures followed by heating at 450 K. The formation of the epitaxial surface sesquioxides is favored by the good lattice match with the Ce substrate. The same type of structural relation might lead to the formation of ordered sesquioxides on other rare-earth surfaces exposing hexagonal planes.

  20. Chemical Vapor Deposition Epitaxy an Patternless and Patterned Substrates.

    ERIC Educational Resources Information Center

    Takoudis, Christos G.

    1990-01-01

    Discusses chemical vapor deposition epitaxy on patternless and patterned substrates for an electronic materials processing course. Describes the processs types and features of epitaxy. Presents some potential problems of epitaxy. Lists 38 references. (YP)

  1. Ge/GeSn heterostructures grown on Si (100) by molecular-beam epitaxy

    SciTech Connect

    Sadofyev, Yu. G. Martovitsky, V. P.; Bazalevsky, M. A.; Klekovkin, A. V.; Averyanov, D. V.; Vasil’evskii, I. S.

    2015-01-15

    The growth of GeSn layers by molecular-beam epitaxy on Si (100) wafers coated with a germanium buffer layer is investigated. The properties of the fabricated structures are controlled by reflection high-energy electron diffraction, atomic-force microscopy, X-ray diffractometry, Rutherford backscattering, and Raman scattering. It is shown that GeSn layers with thicknesses up to 0.5 μm and Sn molar fractions up to 0.073 manifest no sign of plastic relaxation upon epitaxy. The lattice constant of the GeSn layers within the growth plane is precisely the same as that of Ge. The effect of rapid thermal annealing on the conversion of metastable elastically strained GeSn layers into a plastically relaxed state is examined. Ge/GeSn quantum wells with Sn molar fraction up to 0.11 are obtained.

  2. Studies of molecular-beam epitaxy growth of GaAs on porous Si substrates

    NASA Technical Reports Server (NTRS)

    Mii, Y. J.; Kao, Y. C.; Wu, B. J.; Wang, K. L.; Lin, T. L.; Liu, J. K.

    1988-01-01

    GaAs has been grown on porous Si directly and on Si buffer layer-porous Si substrates by molecular-beam epitaxy. In the case of GaAs growth on porous Si, transmission electron microscopy (TEM) reveals that the dominant defects in GaAs layers grown on porous Si are microtwins and stacking faults, which originate from the GaAs/porous Si interface. GaAs is found to penetrate into the porous Si layers. By using a thin Si buffer layer (50 nm), GaAs penetration diminishes and the density of microtwins and stacking faults is largely reduced and localized at the GaAs/Si buffer interface. However, there is a high density of threading dislocations remaining. Both Si (100) aligned and four degree tilted substrates have been examined in this study. TEM results show no observable effect of the tilted substrates on the quality of the GaAs epitaxial layer.

  3. Method utilizing laser-processing for the growth of epitaxial p-n junctions

    DOEpatents

    Young, R.T.; Narayan, J.; Wood, R.F.

    1979-11-23

    This invention is a new method for the formation of epitaxial p-n junctions in silicon. The method is relatively simple, rapid, and reliable. It produces doped epitaxial layers which are of well-controlled thickness and whose electrical properties are satisfactory. An illustrative form of the method comprises co-depositing a selected dopant and amorphous silicon on a crystalline silicon substrate to form a doped layer of amorphous silicon thereon. This layer then is irradiated with at least one laser pulse to generate a melt front which moves through the layer, into the silicon body to a depth effecting melting of virginal silicon, and back to the surface of the layer. The method may be conducted with dopants (e.g., boron and phosphorus) whose distribution coefficients approximate unity.

  4. Recent developments in droplet epitaxy

    SciTech Connect

    Mano, Takaaki; Jo, Masafumi; Kuroda, Takashi; Abbarchi, Marco; Noda, Takeshi; Sakoda, Kazuaki

    2014-05-15

    The droplet epitaxy allows for self-assembly of lattice-matched GaAs quantum dots (QDs) with high quality and high uniformity. In this article, we show our efforts to realize the GaAs QDs with excellent optical properties. After the optimization of the several growth processes, we achieved current-injection lasing in the GaAs QDs. In addition, formation of further advanced nanostructure is presented.

  5. Method of transferring a thin crystalline semiconductor layer

    DOEpatents

    Nastasi, Michael A.; Shao, Lin; Theodore, N. David

    2006-12-26

    A method for transferring a thin semiconductor layer from one substrate to another substrate involves depositing a thin epitaxial monocrystalline semiconductor layer on a substrate having surface contaminants. An interface that includes the contaminants is formed in between the deposited layer and the substrate. Hydrogen atoms are introduced into the structure and allowed to diffuse to the interface. Afterward, the thin semiconductor layer is bonded to a second substrate and the thin layer is separated away at the interface, which results in transferring the thin epitaxial semiconductor layer from one substrate to the other substrate.

  6. Effect of nitridation surface treatment on silicon (1 1 1) substrate for the growth of high quality single-crystalline GaN hetero-epitaxy layer by MOCVD

    NASA Astrophysics Data System (ADS)

    Rahman, Mohd Nazri Abd.; Yusuf, Yusnizam; Mansor, Mazwan; Shuhaimi, Ahmad

    2016-01-01

    A single-crystalline with high quality of gallium nitride epilayers was grown on silicon (1 1 1) substrate by metal organic chemical vapor deposition. The process of nitridation surface treatment was accomplished on silicon (1 1 1) substrate by flowing the ammonia gaseous. Then, it was followed by a thin aluminum nitride nucleation layer, aluminum nitride/gallium nitride multi-layer and a thick gallium nitride epilayer. The influence of in situ nitridation surface treatment on the crystallinity quality of gallium nitride epilayers was studied by varying the nitridation times at 40, 220 and 400 s, respectively. It was shown that the nitridation times greatly affect the structural properties of the grown top gallium nitride epilayer on silicon (1 1 1) substrate. In the (0 0 0 2) and (1 0 1 bar 2) X-ray rocking curve analysis, a narrower value of full width at half-maximum has been obtained as the nitridation time increased. This is signifying the reduction of dislocation density in the gallium nitride epilayer. This result was supported by the value of bowing and root mean square roughness measured by surface profilometer and atomic force microscopy. Furthermore, a crack-free gallium nitride surface with an abrupt cross-sectional structure that observed using field effect scanning electron microscopy was also been obtained. The phi-scan curve of asymmetric gallium nitride proved the top gallium nitride epilayer exhibited a single-crystalline structure.

  7. Selective-area epitaxial growth of GaAs in deep dielectric windows using molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Loke, W. K.; Yoon, S. F.; Zheng, H. Q.

    2001-01-01

    An improved selective-area epitaxial growth process for GaAs in deep dielectric windows (DDWs) is reported. The growth was carried out on (100)-oriented semi-insulating (SI) GaAs substrate at ˜520°C by solid source molecular beam epitaxy (SSMBE) using a valved arsenic cracker source. Dielectric stacks with 10 periods of alternating silicon nitride (2000 Å) and silicon dioxide (1000 Å) layers were deposited using plasma-enhanced chemical vapor deposition (PECVD) for the formation of deep (3 μm) dielectric windows. The alternating dielectric layer stack has been shown to be of greater stability than a single dielectric layer for the purpose of forming the DDW. A process of fabricating the DDW structures, which eliminates the possible contamination at the growth area during photoresist patterning and removing, and subsequent etching of the DDW, has resulted in improved epitaxial layer quality. Micro-Raman spectroscopy measurements showed a significant increase in the longitudinal-optic (LO) to transverse-optic (TO) signal intensity ratio ( ILO/TO) from ˜4.0 to ˜16.0 of the first-order Raman line of GaAs. Supporting evidence from low-temperature (4 K) photoluminescence (PL) showed a reduction in intensity of the conduction band to neutral carbon acceptor (e-C°) emission by a factor of 4.5. This suggests lower levels of carbon contamination originating from the improved fabrication process of the DDW. Scanning electron microscopy (SEM) images showed smoother surface morphology of the GaAs inside the DDW area. These results have important implications on the process of MBE regrowth for optoelectronics integration.

  8. Solution phase van der Waals epitaxy of ZnO wire arrays

    NASA Astrophysics Data System (ADS)

    Zhu, Yue; Zhou, Yong; Bakti Utama, Muhammad Iqbal; Mata, María De La; Zhao, Yanyuan; Zhang, Qing; Peng, Bo; Magen, Cesar; Arbiol, Jordi; Xiong, Qihua

    2013-07-01

    As an incommensurate epitaxy, van der Waals epitaxy allows defect-free crystals to grow on substrates even with a large lattice mismatch. Furthermore, van der Waals epitaxy is proposed as a universal platform where heteroepitaxy can be achieved irrespective of the nature of the overlayer material and the method of crystallization. Here we demonstrate van der Waals epitaxy in solution phase synthesis for seedless and catalyst-free growth of ZnO wire arrays on phlogopite mica at low temperature. A unique incommensurate interface is observed even with the incomplete initial wetting of ZnO onto the substrate. Interestingly, the imperfect contacting layer does not affect the crystalline and optical properties of other parts of the wires. In addition, we present patterned growth of a well-ordered array with hexagonal facets and in-plane alignment. We expect our seedless and catalyst-free solution phase van der Waals epitaxy synthesis to be widely applicable in other materials and structures.As an incommensurate epitaxy, van der Waals epitaxy allows defect-free crystals to grow on substrates even with a large lattice mismatch. Furthermore, van der Waals epitaxy is proposed as a universal platform where heteroepitaxy can be achieved irrespective of the nature of the overlayer material and the method of crystallization. Here we demonstrate van der Waals epitaxy in solution phase synthesis for seedless and catalyst-free growth of ZnO wire arrays on phlogopite mica at low temperature. A unique incommensurate interface is observed even with the incomplete initial wetting of ZnO onto the substrate. Interestingly, the imperfect contacting layer does not affect the crystalline and optical properties of other parts of the wires. In addition, we present patterned growth of a well-ordered array with hexagonal facets and in-plane alignment. We expect our seedless and catalyst-free solution phase van der Waals epitaxy synthesis to be widely applicable in other materials and structures

  9. Epitaxial lift-off process for gallium arsenide substrate reuse and flexible electronics.

    PubMed

    Cheng, Cheng-Wei; Shiu, Kuen-Ting; Li, Ning; Han, Shu-Jen; Shi, Leathen; Sadana, Devendra K

    2013-01-01

    Epitaxial lift-off process enables the separation of III-V device layers from gallium arsenide substrates and has been extensively explored to avoid the high cost of III-V devices by reusing the substrates. Conventional epitaxial lift-off processes require several post-processing steps to restore the substrate to an epi-ready condition. Here we present an epitaxial lift-off scheme that minimizes the amount of post-etching residues and keeps the surface smooth, leading to direct reuse of the gallium arsenide substrate. The successful direct substrate reuse is confirmed by the performance comparison of solar cells grown on the original and the reused substrates. Following the features of our epitaxial lift-off process, a high-throughput technique called surface tension-assisted epitaxial lift-off was developed. In addition to showing full wafer gallium arsenide thin film transfer onto both rigid and flexible substrates, we also demonstrate devices, including light-emitting diode and metal-oxide-semiconductor capacitor, first built on thin active layers and then transferred to secondary substrates.

  10. Process for selectively patterning epitaxial film growth on a semiconductor substrate

    DOEpatents

    Sheldon, P.; Hayes, R.E.

    1984-12-04

    Disclosed is a process for selectively patterning epitaxial film growth on a semiconductor substrate. The process includes forming a masking member on the surface of the substrate, the masking member having at least two layers including a first layer disposed on the substrate and the second layer covering the first layer. A window is then opened in a selected portion of the second layer by removing that portion to expose the first layer thereunder. The first layer is then subjected to an etchant introduced through the window to dissolve the first layer a sufficient amount to expose the substrate surface directly beneath the window, the first layer being adapted to preferentially dissolve at a substantially greater rate than the second layer so as to create an overhanging ledge portion with the second layer by undercutting the edges thereof adjacent the window. The epitaxial film is then deposited on the exposed substrate surface directly beneath the window. Finally, an etchant is introduced through the window to dissolve the remainder of the first layer so as to lift-off the second layer and materials deposited thereon to fully expose the balance of the substrate surface.

  11. Process for selectively patterning epitaxial film growth on a semiconductor substrate

    DOEpatents

    Sheldon, Peter; Hayes, Russell E.

    1986-01-01

    A process is disclosed for selectively patterning epitaxial film growth on a semiconductor substrate. The process includes forming a masking member on the surface of the substrate, the masking member having at least two layers including a first layer disposed on the substrate and the second layer covering the first layer. A window is then opened in a selected portion of the second layer by removing that portion to expose the first layer thereunder. The first layer is then subjected to an etchant introduced through the window to dissolve a sufficient amount of the first layer to expose the substrate surface directly beneath the window, the first layer being adapted to preferentially dissolve at a substantially greater rate than the second layer so as to create an overhanging ledge portion with the second layer by undercutting the edges thereof adjacent to the window. The epitaxial film is then deposited on the exposed substrate surface directly beneath the window. Finally, an etchant is introduced through the window to dissolve the remainder of the first layer so as to lift-off the second layer and materials deposited thereon to fully expose the balance of the substrate surface.

  12. Epitaxial deposition of silver ultra-fine nano-clusters on defect-free surfaces of HOPG-derived few-layer graphene in a UHV multi-chamber by in situ STM, ex situ XPS, and ab initio calculations.

    PubMed

    Ndlovu, Gebhu F; Roos, Wiets D; Wang, Zhiming M; Asante, Joseph Ko; Mashapa, Matete G; Jafta, Charl J; Mwakikunga, Bonex W; Hillie, Kenneth T

    2012-01-01

    The growth of three-dimensional ultra-fine spherical nano-particles of silver on few layers of graphene derived from highly oriented pyrolytic graphite in ultra-high vacuum were characterized using in situ scanning tunneling microscopy (STM) in conjunction with X-ray photoelectron spectroscopy. The energetics of the Ag clusters was determined by DFT simulations. The Ag clusters appeared spherical with size distribution averaging approximately 2 nm in diameter. STM revealed the preferred site for the position of the Ag atom in the C-benzene ring of graphene. Of the three sites, the C-C bridge, the C-hexagon hollow, and the direct top of the C atom, Ag prefers to stay on top of the C atom, contrary to expectation of the hexagon-close packing. Ab initio calculations confirm the lowest potential energy between Ag and the graphene structure to be at the exact site determined from STM imaging.

  13. Epitaxial deposition of silver ultra-fine nano-clusters on defect-free surfaces of HOPG-derived few-layer graphene in a UHV multi-chamber by in situ STM, ex situ XPS, and ab initio calculations

    PubMed Central

    2012-01-01

    The growth of three-dimensional ultra-fine spherical nano-particles of silver on few layers of graphene derived from highly oriented pyrolytic graphite in ultra-high vacuum were characterized using in situ scanning tunneling microscopy (STM) in conjunction with X-ray photoelectron spectroscopy. The energetics of the Ag clusters was determined by DFT simulations. The Ag clusters appeared spherical with size distribution averaging approximately 2 nm in diameter. STM revealed the preferred site for the position of the Ag atom in the C-benzene ring of graphene. Of the three sites, the C-C bridge, the C-hexagon hollow, and the direct top of the C atom, Ag prefers to stay on top of the C atom, contrary to expectation of the hexagon-close packing. Ab initio calculations confirm the lowest potential energy between Ag and the graphene structure to be at the exact site determined from STM imaging. PMID:22395057

  14. A fabrication technology for epitaxial Ni-Mn-Ga microactuators

    NASA Astrophysics Data System (ADS)

    Khelfaoui, F.; Kohl, M.; Buschbeck, J.; Heczko, O.; Fähler, S.; Schultz, L.

    2008-05-01

    This paper reports on the fabrication and characterization of epitaxial Ni-Mn-Ga microactuators. Ni-Mn-Ga films are grown on heated single-crystalline MgO substrates by DC magnetron sputtering. X-ray diffraction measurements demonstrate epitaxial growth of the films. At room temperature, the crystal structure is identified to be non-modulated (NM) tetragonal martensite. Electrical resistance measurements confirm that the films display the martensitic phase transformation well above the Curie temperature TC of 325 K. Orientation-dependent magnetization measurements are performed to determine magnetic film properties. Micromachining of the Ni-Mn-Ga films is performed on an alumina substrate covered by a temporary adhesive layer. A transfer bonding process is developed to finally integrate the micromachined Ni-Mn-Ga structures to a target substrate in order to obtain NiMnGa microactuators having freely movable microparts. Temperature-displacement characteristics demonstrate the actuation performance of epitaxial NiMnGa microactuators for the first time.

  15. Exchange bias and crystal structure of epitaxial (111) FePt/BiFeO{sub 3} sputtered thin films

    SciTech Connect

    Chiu, Shang-Jui; Hsiao, Shih-Nan Lee, Hsin-Yi; Huang, Li-Chun; Yu, Ge-Ping; Chang, Huang-Wei

    2014-05-07

    Crystallographic structure and magnetic properties of the epitaxial FePt (10 nm)/BiFeO{sub 3} (BFO) (10 nm) bilayer films grown on (111) SrTiO{sub 3} (STO) substrates with different deposition temperatures of FePt layers (T{sub d}) have been investigated using magnetron sputtering. Out-of-plane radial scan along (111) direction and off-normal (002) azimuthal scan, determined by synchrotron radiation x-ray diffractometry, evidence that the FePt layers were well epitaxially grown on the (111) epitaxial BFO layers for the samples with T{sub d} = 300 and 700 °C. On the contrary, for the bilayer films with T{sub d} = 500 °C, the FePt and BFO layers exhibit low epitaxial quality. Large in-plane exchange bias field (H{sub eb}) values of 45–412 Oe are obtained for the L1{sub 0}-FePt/BFO bilayer films measured with applied field of 12 kOe at room temperature. The change of effective interfacial area, observed by scanning electron microscopy, between FePt island-like particles and BFO continuous layers, and epitaxiality of the bilayer were correlated with the evolution of H{sub eb}.

  16. Epitaxial Relationship Analysis Between ZnTe Epilayers and Sapphire Substrates

    NASA Astrophysics Data System (ADS)

    Nakasu, Taizo; Aiba, Takayuki; Yamashita, Sotaro; Hattori, Shota; Kizu, Takeru; Sun, Wei-Che; Taguri, Kosuke; Kazami, Fukino; Hashimoto, Yuki; Ozaki, Shun; Kobayashi, Masakazu; Asahi, Toshiaki

    2016-10-01

    Zinc telluride (ZnTe) epilayers were grown on S-plane (10bar{1}1) sapphire substrates by molecular beam epitaxy, and the epitaxial relationships between the two were compared with data previously obtained for layers grown on c-plane (0001), m-plane (10bar{1}0 ) substrates, and r-plane (1bar{1}02 ). The crystallographic relationship between the (111) plane of the ZnTe layer and (0001) plane of the substrate was studied using x-ray diffraction pole figure measurements. It was confirmed that two kinds of {111} oriented domains were formed on the S-plane substrate, and the dominant domain was (111)-oriented. Layers grown on S-plane substrate and on m-plane substrate exhibited the same epitaxial relationship, while the epitaxial relationship of the layer grown on the c-plane substrate exhibited a 60° rotation. These findings would be applicable to control the orientation of ZnTe epilayer surface for various device applications and for various physical property characterizations.

  17. Epitaxial growth of intermetallic MnPt films on oxides and large exchange bias

    DOE PAGES

    Liu, Zhiqi; Biegalski, Michael D.; Hsu, Shang-Lin; Shang, Shunli; Marker, Cassie; Liu, Jian; Li, Li; Fan, Lisha S.; Meyer, Tricia L.; Wong, Anthony T.; et al

    2015-11-05

    High-quality epitaxial growth of intermetallic MnPt films on oxides is achieved, with potential for multiferroic heterostructure applications. Antisite-stabilized spin-flipping induces ferromagnetism in MnPt films, although it is robustly antiferromagnetic in bulk. Thus, highly ordered antiferromagnetic MnPt films exhibit superiorly large exchange coupling with a ferromagnetic layer.

  18. Effect of GaN interlayer on polarity control of epitaxial ZnO thin films grown by molecular beam epitaxy

    SciTech Connect

    Wang, X. Q.; Sun, H. P.; Pan, X. Q.

    2010-10-11

    Epitaxial ZnO thin films were grown on nitrided (0001) sapphire substrates with an intervening GaN layer by rf-plasma-assisted molecular beam epitaxy. It was found that polarity of the ZnO epilayer could be controlled by modifying the GaN interlayer. ZnO grown on a distorted 3-nm-thick GaN interlayer has Zn-polarity while ZnO on a 20-nm-thick GaN interlayer with a high structural quality has O-polarity. High resolution transmission electron microscopy analysis indicates that the polarity of ZnO epilayer is controlled by the atomic structure of the interface between the ZnO buffer layer and the intervening GaN layer.

  19. In-situ microscopic observation of GaAs surfaces during molecular beam epitaxy and metalorganic molecular beam epitaxy by scanning microprobe reflection high energy electron diffraction

    NASA Astrophysics Data System (ADS)

    Isu, Toshiro; Watanabe, Akiyoshi; Hata, Masayuki; Katayama, Yoshifumi

    1990-03-01

    Microscopic observations of epitaxial growth layers of GaAs were made with a scanning microprobe reflection high energy electron diffraction (RHEED). A scanning microprobe electron gun has been combined with a specially designed molecular beam epitaxy (MBE) system with both solid sources and gas sources. Scanning reflection electron microscope (SREM) images using the specular beam spot revealed granular features over the entire surfaces of MBE-grown GaAs layers, which were thought to come from undulation of the surface. Similar features of the surface were observed on the layers grown by gas-source MBE using trimethylgallium and arsine. A microscopic surface morphology was found to be fairly rough and the features depended on the species of the sources and growth conditions.

  20. Structural evolution during deposition of epitaxial Fe/Pt(001) multilayers

    SciTech Connect

    Hufnagel, T.C.; Kautzky, M.C.; Daniels, B.J.; Clemens, B.M.

    1999-03-01

    We have investigated the structure of epitaxial Fe/Pt(001) multilayers deposited by direct current magnetron sputtering. In these multilayers, the structure of the Fe layers depends on their thickness: Thick (t{sub Fe}{gt}22thinsp{Angstrom}) Fe layers are body-centered cubic (bcc), while thin (t{sub Fe}{lt}12thinsp{Angstrom}) Fe layers are face-centered cubic (fcc). {ital Ex situ} x-ray diffraction reveals that the unstrained lattice parameter of bcc Fe in epitaxial multilayers is significantly greater than that of bulk bcc Fe, possibly due to alloying with Pt. This suggests that the observed {open_quotes}fcc Fe{close_quotes} is actually an intermixed fcc Fe{endash}Pt interfacial layer. To investigate this possibility, we have performed grazing-incidence x-ray scattering {ital in situ} during deposition of epitaxial Fe/Pt(001) multilayers. The structure of Fe(001) layers as thin as 10 {Angstrom} is bcc, strained due to epitaxial mismatch with the Pt(001) underlayer. Additional Fe deposition results in relaxation of the bcc Fe lattice parameter toward its bulk value. Deposition of Pt onto a 50 {Angstrom} thick bcc Fe(001) layer has little effect on the Fe, other than to increase its lattice parameter slightly. In contrast, deposition of Pt onto a 20-{Angstrom}-thick bcc Fe(001) layer results in a partial transformation of the Fe to a fcc structure. We propose that this transformation is the result of intermixing of Pt into the previously deposited Fe layer, resulting in the formation of a fcc Fe-Pt alloy layer. {copyright} {ital 1999 American Institute of Physics.}

  1. Epitaxial growth of CZT(S,Se) on silicon

    DOEpatents

    Bojarczuk, Nestor A.; Gershon, Talia S.; Guha, Supratik; Shin, Byungha; Zhu, Yu

    2016-03-15

    Techniques for epitaxial growth of CZT(S,Se) materials on Si are provided. In one aspect, a method of forming an epitaxial kesterite material is provided which includes the steps of: selecting a Si substrate based on a crystallographic orientation of the Si substrate; forming an epitaxial oxide interlayer on the Si substrate to enhance wettability of the epitaxial kesterite material on the Si substrate, wherein the epitaxial oxide interlayer is formed from a material that is lattice-matched to Si; and forming the epitaxial kesterite material on a side of the epitaxial oxide interlayer opposite the Si substrate, wherein the epitaxial kesterite material includes Cu, Zn, Sn, and at least one of S and Se, and wherein a crystallographic orientation of the epitaxial kesterite material is based on the crystallographic orientation of the Si substrate. A method of forming an epitaxial kesterite-based photovoltaic device and an epitaxial kesterite-based device are also provided.

  2. Growth and characterization of epitaxial NiMnSb/ZnTe/NiMnSb magnetic multilayers

    NASA Astrophysics Data System (ADS)

    Gerhard, F.; Naydenova, T.; Baussenwein, M.; Schumacher, C.; Gould, C.; Molenkamp, L. W.

    2016-02-01

    The half-metal ferromagnet NiMnSb, with its high spin polarization, low magnetic damping and tunable magnetic anisotropy, is a promising material for applications in spin torque devices. We develop the epitaxial growth of NiMnSb/ZnTe/NiMnSb heterostructures, aiming towards the realization of an all-NiMnSb based magnetic tunneling junction (MTJ). Layers are grown in situ by Molecular Beam Epitaxy (MBE) and Atomic Layer Epitaxy (ALE) methods. By tuning Mn content, the magnetic anisotropy of each of the two NiMnSb layers is adjusted in order to achieve mutually orthogonal uniaxial anisotropies. SQUID measurements of the magnetization along orthogonal crystal directions [110] and [ 1 1 bar 0] confirm that the two layers have mutually orthogonal anisotropy. High Resolution X-Ray Diffraction measurements and simulations confirm the nominal layer stack and demonstrate the high crystalline quality of the individual layers. Such layer stacks provide a potential basis for TMR-based spin-torque devices such as spin-torque oscillators.

  3. Defect studies in MBE grown GaSb{sub 1−x}Bi{sub x} layers

    SciTech Connect

    Segercrantz, N.; Kujala, J.; Tuomisto, F.; Slotte, J.; Song, Y.; Wang, S.

    2014-02-21

    Positron annihilation spectroscopy in Doppler broadening mode is used to study epitaxial layers of GaSb{sub 1−x}Bi{sub x} on undoped GaSb. The samples were grown by Molecular Beam Epitaxy at different temperatures and with different Bi/Sb beam equivalent pressure ratios resulting in Bi concentrations of 0–0.7 %. The results show a relationship between the growth parameters and Doppler broadening parameters. Incorporating Bi into GaSb decreases the vacancy concentration in the epitaxial layers compared to the sample with no Bi in the epitaxial layer.

  4. Arsenic incorporation in molecular beam epitaxy (MBE) grown (AlGaIn)(AsSb) layers for 2.0-2.5 μm laser structures on GaSb substrates

    NASA Astrophysics Data System (ADS)

    Simanowski, S.; Walther, M.; Schmitz, J.; Kiefer, R.; Herres, N.; Fuchs, F.; Maier, M.; Mermelstein, C.; Wagner, J.; Weimann, G.

    1999-05-01

    The incorporation of As and In during MBE growth in (AlGaIn)/(AsSb) layers used for the fabrication of diode lasers in the 2.0-2.5 μm wavelength range has been investigated. The As content was found to depend linearly on the beam equivalent pressure for As mole fractions between y=0.05 and y=0.20. Broad area AlGaAsSb/GaInAsSb single-quantum well laser diodes with quasi-cw output at room temperature at an emission wavelength of 2.03 μm and a threshold current density of 515 A/cm 2 for 1370 μm long and 70 μm wide devices have been fabricated. In order to shift the emission wavelength of the laser structures to longer wavelengths, the growth of lattice matched AlGaAsSb/GaInAsSb laser core structures with different In and As mole fractions in the quantum wells has been investigated.

  5. Apparatus for externally controlled closed-loop feedback digital epitaxy

    DOEpatents

    Eres, D.; Sharp, J.W.

    1996-07-30

    A method and apparatus for digital epitaxy are disclosed. The apparatus includes a pulsed gas delivery assembly that supplies gaseous material to a substrate to form an adsorption layer of the gaseous material on the substrate. Structure is provided for measuring the isothermal desorption spectrum of the growth surface to monitor the active sites which are available for adsorption. The vacuum chamber housing the substrate facilitates evacuation of the gaseous material from the area adjacent the substrate following exposure. In use, digital epitaxy is achieved by exposing a substrate to a pulse of gaseous material to form an adsorption layer of the material on the substrate. The active sites on the substrate are monitored during the formation of the adsorption layer to determine if all the active sites have been filled. Once the active sites have been filled on the growth surface of the substrate, the pulse of gaseous material is terminated. The unreacted portion of the gas pulse is evacuated by continuous pumping. Subsequently, a second pulse is applied when availability of active sites is determined by studying the isothermal desorption spectrum. These steps are repeated until a thin film of sufficient thickness is produced. 5 figs.

  6. Apparatus for externally controlled closed-loop feedback digital epitaxy

    DOEpatents

    Eres, Djula; Sharp, Jeffrey W.

    1996-01-01

    A method and apparatus for digital epitaxy. The apparatus includes a pulsed gas delivery assembly that supplies gaseous material to a substrate to form an adsorption layer of the gaseous material on the substrate. Structure is provided for measuring the isothermal desorption spectrum of the growth surface to monitor the active sites which are available for adsorption. The vacuum chamber housing the substrate facilitates evacuation of the gaseous material from the area adjacent the substrate following exposure. In use, digital epitaxy is achieved by exposing a substrate to a pulse of gaseous material to form an adsorption layer of the material on the substrate. The active sites on the substrate are monitored during the formation of the adsorption layer to determine if all the active sites have been filled. Once the active sites have been filled on the growth surface of the substrate, the pulse of gaseous material is terminated. The unreacted portion of the gas pulse is evacuated by continuous pumping. Subsequently, a second pulse is applied when availability of active sites is determined by studying the isothermal desorption spectrum. These steps are repeated until a thin film of sufficient thickness is produced.

  7. Van der Waals Epitaxy of Functional Oxide Heterostructures

    NASA Astrophysics Data System (ADS)

    Chu, Ying-Hao

    In the diligent pursuit of low-power consumption, multifunctional, and environmentally friendly electronics, more sophisticated requirements on functional materials are on demand. Recently, the discovery of 2D layered materials has created a revolution to this field. Pioneered by graphene, these new 2D materials exhibit abundant unusual physical phenomena that is undiscovered in bulk forms. These materials are characterized with their layer form and almost pure 2D electronic behavior. The confinement of charge and heat transport at such ultrathin planes offers possibilities to overcome the bottleneck of present device development in thickness limitation, and thus push the technologies into next generation. Van der Waals epitaxy, an epitaxial growth method to combine 2D and 3D materials, is one of current reliable manufacturing processes to fabricate 2D materials by growing these 2D materials epitaxially on 3D materials. Then, transferring the 2D materials to the substrates for practical applications. In the mean time, van der Waals epitaxy has also been used to create free-standing 3D materials by growing 3D materials on 2D materials and then removing them from 2D materials since the interfacial boding between 2D and 3D materials should be weak van der Waals bonds. In this study, we intend to take the same concept, but to integrate a family of functional materials in order to open new avenue to flexible electronics. Due to the interplay of lattice, charge, orbital, and spin degrees of freedom, correlated electrons in oxides generate a rich spectrum of competing phases and physical properties. Recently, lots of studies have suggested that oxide heterostructures provide a powerful route to create and manipulate the degrees of freedom and offer new possibilities for next generation devices, thus create a new playground for researchers to investigate novel physics and the emergence of fascinating states of condensed matter. In this talk, we use a 2D layered material as

  8. In situ growth of epitaxial cerium tungstate (100) thin films.

    PubMed

    Skála, Tomáš; Tsud, Nataliya; Orti, Miguel Ángel Niño; Menteş, Tevfik Onur; Locatelli, Andrea; Prince, Kevin Charles; Matolín, Vladimír

    2011-04-21

    The deposition of ceria on a preoxidized W(110) crystal at 870 K has been studied in situ by photoelectron spectroscopy and low-energy electron diffraction. Formation of an epitaxial layer of crystalline cerium tungstate Ce(6)WO(12)(100), with the metals in the Ce(3+) and W(6+) chemical states, has been observed. The interface between the tungsten substrate and the tungstate film consists of WO suboxide. At thicknesses above 0.89 nm, cerium dioxide grows on the surface of Ce(6)WO(12), favoured by the limited diffusion of tungsten from the substrate. PMID:21399780

  9. Molecular-Beam Epitaxy Of IrSi3

    NASA Technical Reports Server (NTRS)

    Lin, True-Lon

    1991-01-01

    Molecular-beam epitaxy grows layers of iridium silicide (IrSi3) on silicon at temperatures of 630 to 800 degrees C. Particularly useful as photodetector material because it forms Schottky diodes having potential barriers of only 0.12 to 0.15 eV - lowest of any metal on silicon. Photodiodes sensitive to infrared radiation at wavelengths as large as 8 to 10 micrometers. New, lower formation temperature expected to enable growth of arrays of IrSi3/Si infrared detectors on Si wafers without thermally damaging image-processing circuitry integrated on wafers.

  10. Highly p-doped epitaxial graphene obtained by fluorine intercalation

    NASA Astrophysics Data System (ADS)

    Walter, Andrew L.; Jeon, Ki-Joon; Bostwick, Aaron; Speck, Florian; Ostler, Markus; Seyller, Thomas; Moreschini, Luca; Kim, Yong Su; Chang, Young Jun; Horn, Karsten; Rotenberg, Eli

    2011-05-01

    We present a method for decoupling epitaxial graphene grown on SiC(0001) by intercalation of a layer of fluorine at the interface. The fluorine atoms do not enter into a covalent bond with graphene but rather saturate the substrate Si bonds. This configuration of the fluorine atoms induces a remarkably large hole density of p ≈4.5×1013 cm-2, equivalent to the location of the Fermi level at 0.79 eV above the Dirac point ED.

  11. Delayed Shutters For Dual-Beam Molecular Epitaxy

    NASA Technical Reports Server (NTRS)

    Grunthaner, Frank J.; Liu, John L.; Hancock, Bruce

    1989-01-01

    System of shutters for dual-molecular-beam epitaxy apparatus delays start of one beam with respect to another. Used in pulsed-beam equipment for deposition of low-dislocation layers of InAs on GaAs substrates, system delays application of arsenic beam with respect to indium beam to assure proper stoichiometric proportions on newly forming InAs surface. Reflectance high-energy electron diffraction (RHEED) instrument used to monitor condition of evolving surface of deposit. RHEED signal used to time pulsing of molecular beams in way that minimizes density of defects and holds lattice constant of InAs to that of GaAs substrate.

  12. Structure and magnetic properties of epitaxial terbium- iron thin films

    NASA Astrophysics Data System (ADS)

    Wang, Chuei-Tang

    TbFe2 is a giant magnetostrictive material which has the largest known room temperature magnetostriction constant. The large magnetostriction constant suggests that we can manipulate the magnetic anisotropy of the material using small strains. Other research groups have grown amorphous and polycrystalline TbFe2 films; however, these films lose giant mangetostriction because of diordered atomic structure in the amorphous films and random grain orientation in the polycrystalline films. Single-crystal structure is needed to achieve the large magnetostriction, so epitaxial growth of TbFe2 thin films is necessary. The goal of this research is to grow epitaxial TbFe2 films and study the effect of film strain on magnetic anisotropy. A technique was developed to grow epitaxial TbFe2films using DC magnetron sputtering. The films were grown in a UHV system using elemental Tb and Fe sputtering targets and single-crystal Al2O3, MgO, and CaF2 substrates. (110) -oriented Mo, W, and Nb were used as buffer layers to provide the base for epitaxial growth and to prevent chemical reactions between the TbFe2 films and the substrates. On the Mo and W buffer layers the TbFe2 film is (111) -oriented but on the Nb buffer layer it is (110) -oriented. Preliminary calculation of magnetostrictive anisotropy in TbFe2(111) films predicts that compressive strain greater than 0.5% will induce perpendicular magnetization while tensile strain greater than 0.5% will induce an in- plane magnetization. Epitaxial growth on CaF2 provides compressive thermal strain of 0.51%, and SQUID measurements confirmed that these samples did have perpendicular magnetization. On the other hand, Al2O3 provides tensile thermal strain of 0.56%, and SQUID measurements showed the films on Al2O3 were in-plane. The values of strain on these three substrates were determined by strain measurement from synchrotron radiation. X-ray epitaxial quality measurements revealed a new orientation relationship, R30o, at the TbFe2

  13. Effect of Z{sub 1/2}, EH{sub 5}, and Ci1 deep defects on the performance of n-type 4H-SiC epitaxial layers Schottky detectors: Alpha spectroscopy and deep level transient spectroscopy studies

    SciTech Connect

    Mannan, Mohammad A.; Chaudhuri, Sandeep K.; Nguyen, Khai V.; Mandal, Krishna C.

    2014-06-14

    Spectroscopic performance of Schottky barrier alpha particle detectors fabricated on 50 μm thick n-type 4H-SiC epitaxial layers containing Z{sub 1/2}, EH{sub 5}, and Ci1 deep levels were investigated. The device performance was evaluated on the basis of junction current/capacitance characterization and alpha pulse-height spectroscopy. Capacitance mode deep level transient spectroscopy revealed the presence of the above-mentioned deep levels along with two shallow level defects related to titanium impurities (Ti(h) and Ti(c)) and an unidentified deep electron trap located at 2.4 eV below the conduction band minimum, which is being reported for the first time. The concentration of the lifetime killer Z{sub 1/2} defects was found to be 1.7 × 10{sup 13} cm{sup −3}. The charge transport and collection efficiency results obtained from the alpha particle pulse-height spectroscopy were interpreted using a drift-diffusion charge transport model. Based on these investigations, the physics behind the correlation of the detector properties viz., energy resolution and charge collection efficiency, the junction properties like uniformity in barrier-height, leakage current, and effective doping concentration, and the presence of defects has been discussed in details. The studies also revealed that the dominating contribution to the charge collection efficiency was due to the diffusion of charge carriers generated in the neutral region of the detector. The 10 mm{sup 2} large area detectors demonstrated an impressive energy resolution of 1.8% for 5486 keV alpha particles at an optimized operating reverse bias of 130 V.

  14. Epitaxial growth of cadmium sulfide films on silicon

    NASA Astrophysics Data System (ADS)

    Antipov, V. V.; Kukushkin, S. A.; Osipov, A. V.

    2016-03-01

    A 300-nm-thick cadmium sulfide epitaxial layer on silicon was grown for the first time. The grown was performed by the method of evaporation and condensation in a quasi-closed volume at a substrate temperature of 650°C and a growth time of 4 s. In order to avoid a chemical reaction between silicon and cadmium sulfide (at this temperature, the rate constant of the reaction is ~103) and to prevent etching of silicon by sulfur, a high-quality silicon carbide buffer layer ~100 nm thick was preliminarily synthesized by the substitution of atoms on the silicon surface. The ellipsometric, Raman, electron diffraction, and trace element analyses showed a high structural perfection of the CdS layer and the absence of a polycrystalline phase.

  15. Epitaxial growth of 6H silicon carbide in the temperature range 1320 C to 1390 C

    NASA Technical Reports Server (NTRS)

    Will, H. A.; Powell, J. A.

    1974-01-01

    High-quality epitaxial layers of 6H SiC have been grown on 6H SiC substrates with the grown direction perpendicular to the crystal c-axis. The growth was by chemical vapor deposition from methyltrichlorosilane (CH3SiCl3) in hydrogen at temperatures in the range of 1320 to 1390 C. Epitaxial layers up to 80 microns thick were grown at rates of 0.4 microns/min. Attempts at growth on the (0001) plane of 6H SiC substrates under similar conditions resulted in polycrystalline cubic SiC layers. Optical and X-ray diffraction techniques were used to characterize the grown layers.

  16. Epitaxial Growth of CaF2 Films on Si(111) Studied by Scanning Tunneling Microscopy

    NASA Astrophysics Data System (ADS)

    Kametani, Keisuke; Sudoh, Koichi; Iwasaki, Hiroshi

    2002-01-01

    Using ultrahigh vacuum scanning tunneling microscopy, we have studied the early stages of the epitaxial growth of CaF2 films on Si(111) at 630°C at a slow deposition rate of 0.2 monolayer (ML) per minute. After formation of CaF interface layer, we observe the film grows in the sequence of step edge decoration, one-dimensional islands growth on the terrace, formation of clusters of the islands, coalescence of the island cluster and filling of gaps between the one-dimensional islands in the cluster and between the island clusters to complete a layer. By such a sequence, epitaxial CaF2 films with atomically flat surface could be grown in layer-by-layer fashion up to 3 ML. The growth mode is discussed in relation to kinetic phase diagram [M. A. Olmstead: Thin Films: Heteroepitaxial Systems, eds. W. K. Liu and M. B. Santos (World Scientific, Singapore, 1999) Chap. 5].

  17. Process for growing a film epitaxially upon an oxide surface and structures formed with the process

    DOEpatents

    McKee, Rodney Allen; Walker, Frederick Joseph

    1998-01-01

    A process and structure wherein a film comprised of a perovskite or a spinel is built epitaxially upon a surface, such as an alkaline earth oxide surface, involves the epitaxial build up of alternating constituent metal oxide planes of the perovskite or spinel. The first layer of metal oxide built upon the surface includes a metal element which provides a small cation in the crystalline structure of the perovskite or spinel, and the second layer of metal oxide built upon the surface includes a metal element which provides a large cation in the crystalline structure of the perovskite or spinel. The layering sequence involved in the film build up reduces problems which would otherwise result from the interfacial electrostatics at the first atomic layers, and these oxides can be stabilized as commensurate thin films at a unit cell thickness or grown with high crystal quality to thicknesses of 0.5-0.7 .mu.m for optical device applications.

  18. Process for growing a film epitaxially upon an oxide surface and structures formed with the process

    DOEpatents

    McKee, Rodney A.; Walker, Frederick J.

    1995-01-01

    A process and structure wherein a film comprised of a perovskite or a spinel is built epitaxially upon a surface, such as an alkaline earth oxide surface, involves the epitaxial build up of alternating constituent metal oxide planes of the perovskite or spinel. The first layer of metal oxide built upon the surface includes a metal element which provides a small cation in the crystalline structure of the perovskite or spinel, and the second layer of metal oxide built upon the surface includes a metal element which provides a large cation in the crystalline structure of the perovskite or spinel. The layering sequence involved in the film build up reduces problems which would otherwise result from the interfacial electrostatics at the first atomic layers, and these oxides can be stabilized as commensurate thin films at a unit cell thickness or grown with high crystal quality to thicknesses of 0.5-0.7 .mu.m for optical device applications.

  19. Molecular-Beam-Epitaxy Program

    NASA Technical Reports Server (NTRS)

    Sparks, Patricia D.

    1988-01-01

    Molecular Beam Epitaxy (MBE) computer program developed to aid in design of single- and double-junction cascade cells made of silicon. Cascade cell has efficiency 1 or 2 percent higher than single cell, with twice the open-circuit voltage. Input parameters include doping density, diffusion lengths, thicknesses of regions, solar spectrum, absorption coefficients of silicon (data included for 101 wavelengths), and surface recombination velocities. Results include maximum power, short-circuit current, and open-circuit voltage. Program written in FORTRAN IV.

  20. Transfer-free electrical insulation of epitaxial graphene from its metal substrate.

    PubMed

    Lizzit, Silvano; Larciprete, Rosanna; Lacovig, Paolo; Dalmiglio, Matteo; Orlando, Fabrizio; Baraldi, Alessandro; Gammelgaard, Lauge; Barreto, Lucas; Bianchi, Marco; Perkins, Edward; Hofmann, Philip

    2012-09-12

    High-quality, large-area epitaxial graphene can be grown on metal surfaces, but its transport properties cannot be exploited because the electrical conduction is dominated by the substrate. Here we insulate epitaxial graphene on Ru(0001) by a stepwise intercalation of silicon and oxygen, and the eventual formation of a SiO(2) layer between the graphene and the metal. We follow the reaction steps by X-ray photoemission spectroscopy and demonstrate the electrical insulation using a nanoscale multipoint probe technique.