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Sample records for advanced lithography applications

  1. Swords to plowshares: Shock wave applications to advanced lithography

    SciTech Connect

    Trucano, T.G.; Grady, D.E.; Kubiak, G.D.; Kipp, M.E.; Olson, R.E.; Farnsworth, A.

    1995-03-01

    Extreme UltraViolet Lithography (EUVL) seeks to apply radiation in a wavelength region centered near 13 nm to produce microcircuits having features sizes 0.1 micron or less. A critical requirement for the commercial application of this technology is the development of an economical, compact source of this radiation which is suitable for lithographic applications. A good candidate is a laser-plasma source, which is generated by the interaction of an intermediate intensity laser pulse (up to 10{sup 12} W/cm{sup 2}) with a metallic target. While such a source has radiative characteristics which satisfy the needs of an EUVL source, the debris generated during the laser-target interaction strikes at the economy of the source. Here, the authors review the use of concepts and computer modeling, originally developed for hypervelocity impact analysis, to study this problem.

  2. Advanced Mask Aligner Lithography (AMALITH)

    NASA Astrophysics Data System (ADS)

    Voelkel, Reinhard; Vogler, Uwe; Bramati, Arianna

    2015-03-01

    Mask aligner lithography is very attractive for less-critical lithography layers and is widely used for LED, display, CMOS image sensor, micro-fluidics and MEMS manufacturing. Mask aligner lithography is also a preferred choice the semiconductor back-end for 3D-IC, TSV interconnects, advanced packaging (AdP) and wafer-level-packaging (WLP). Mask aligner lithography is a mature technique based on shadow printing and has not much changed since the 1980s. In shadow printing lithography a geometric pattern is transferred by free-space propagation from a photomask to a photosensitive layer on a wafer. The inherent simplicity of the pattern transfer offers ease of operation, low maintenance, moderate capital expenditure, high wafers-per-hour (WPH) throughput, and attractive cost-of-ownership (COO). Advanced mask aligner lithography (AMALITH) comprises different measures to improve shadow printing lithography beyond current limits. The key enabling technology for AMALITH is a novel light integrator systems, referred to as MO Exposure Optics® (MOEO). MOEO allows to fully control and shape the properties of the illumination light in a mask aligner. Full control is the base for accurate simulation and optimization of the shadow printing process (computational lithography). Now photolithography enhancement techniques like customized illumination, optical proximity correction (OPC), phase masks (AAPSM), half-tone lithography and Talbot lithography could be used in mask aligner lithography. We summarize the recent progress in advanced mask aligner lithography (AMALITH) and discuss possible measures to further improve shadow printing lithography.

  3. Microfluidic Applications of Soft Lithography

    SciTech Connect

    Rose, K A; Krulevitch, P; Hamilton, J

    2001-04-10

    The soft lithography fabrication technique was applied to three microfluidic devices. The method was used to create an original micropump design and retrofit to existing designs for a DNA manipulation device and a counter biological warfare sample preparation device. Each device presented unique and original challenges to the soft lithography application. AI1 design constraints of the retrofit devices were satisfied using PDMS devices created through variation of soft lithography methods. The micropump utilized the versatility of PDMS, creating design options not available with other materials. In all cases, the rapid processing of soft lithography reduced the fabrication time, creating faster turnaround for design modifications.

  4. Enhancements of extreme ultraviolet emission using prepulsed Sn laser-produced plasmas for advanced lithography applications

    SciTech Connect

    Freeman, J. R.; Harilal, S. S.; Hassanein, A.

    2011-10-15

    Laser-produced plasmas (LPP) from Sn targets are seriously considered to be the light source for extreme ultraviolet (EUV) next generation lithography, and optimization of such a source will lead to improved efficiency and reduced cost of ownership of the entire lithography system. We investigated the role of reheating a prepulsed plasma and its effect on EUV conversion efficiency (CE). A 6 ns, 1.06 {mu}m Nd:yttrium aluminum garnet laser was used to generate the initial plasma that was then reheated by a 40 ns, 10.6 {mu}m CO{sub 2} laser to generate enhanced EUV emission from a planar Sn target. The effects of prepulsed laser intensity and delay timings between the prepulsed and the pumping pulse were investigated to find the optimal pre-plasma conditions before the pumping pulse. The initial optimization of these parameters resulted in 25% increase in CE from the tin LPP. The cause of increased EUV emission was identified from EUV emission spectra and ion signal data.

  5. Functional block copolymers for applications in advanced materials, energy storage, and lithography

    NASA Astrophysics Data System (ADS)

    Hardy, Christopher George

    Block copolymers spontaneously self-assembly into a wide variety of ordered nanostructures on the length scale of 5 - 100 nm due to the thermodynamic immiscibility between the covalently linked, chemically distinct polymer chains. Incorporating desirable functional groups into block copolymer systems can lead to confinement of the functional group to a specific domain upon microphase separation of the block copolymer. The resulting materials display desirable characteristics of the functional group in a well-ordered nanostructure. Such systems have been utilized in a wide variety of applications including catalysis, ceramic materials, and membranes. This dissertation is focused on the synthesis, characterization, self-assembly and materials processing of various functionalized block copolymer systems. An assortment of monomers functionalized with specific groups were prepared and polymerized by a variety of polymerization techniques including atom transfer radical polymerization, reversible addition-fragmentation chain transfer polymerization, and ring-opening metathesis polymerization. Self-assembly of the functionalized block copolymers led to well defined nanostructures in bulk and thin films. Depending upon the functional group incorporated, the ordered materials were utilized in various applications including ordered catalysts, energy storage, and templates for nanolithography..

  6. Mask cost of ownership for advanced lithography

    NASA Astrophysics Data System (ADS)

    Muzio, Edward G.; Seidel, Philip K.

    2000-07-01

    As technology advances, becoming more difficult and more expensive, the cost of ownership (CoO) metric becomes increasingly important in evaluating technical strategies. The International SEMATECH CoC analysis has steadily gained visibility over the past year, as it attempts to level the playing field between technology choices, and create a fair relative comparison. In order to predict mask cots for advanced lithography, mask process flows are modeled using bets-known processing strategies, equipment cost, and yields. Using a newly revised yield mode, and updated mask manufacture flows, representative mask flows can be built. These flows are then used to calculate mask costs for advanced lithography down to the 50 nm node. It is never the goal of this type of work to provide absolute cost estimates for business planning purposes. However, the combination of a quantifiable yield model with a clearly defined set of mask processing flows and a cost model based upon them serves as an excellent starting point for cost driver analysis and process flow discussion.

  7. 75 FR 44015 - Certain Semiconductor Products Made by Advanced Lithography Techniques and Products Containing...

    Federal Register 2010, 2011, 2012, 2013, 2014

    2010-07-27

    ... COMMISSION Certain Semiconductor Products Made by Advanced Lithography Techniques and Products Containing... importation of certain semiconductor products made by advanced lithography techniques and products containing... certain semiconductor products made by advanced lithography techniques or products containing same...

  8. Inverse lithography technique for advanced CMOS nodes

    NASA Astrophysics Data System (ADS)

    Villaret, Alexandre; Tritchkov, Alexander; Entradas, Jorge; Yesilada, Emek

    2013-04-01

    Resolution Enhancement Techniques have continuously improved over the last decade, driven by the ever growing constraints of lithography process. Despite the large number of RET applied, some hotspot configurations remain challenging for advanced nodes due to aggressive design rules. Inverse Lithography Technique (ILT) is evaluated here as a substitute to the dense OPC baseline. Indeed ILT has been known for several years for its near-to-ideal mask quality, while also being potentially more time consuming in terms of OPC run and mask processing. We chose to evaluate Mentor Graphics' ILT engine "pxOPCTM" on both lines and via hotspot configurations. These hotspots were extracted from real 28nm test cases where the dense OPC solution is not satisfactory. For both layer types, the reference OPC consists of a dense OPC engine coupled to rule-based and/or model-based assist generation method. The same CM1 model is used for the reference and the ILT OPC. ILT quality improvement is presented through Optical Rule Check (ORC) results with various adequate detectors. Several mask manufacturing rule constraints (MRC) are considered for the ILT solution and their impact on process ability is checked after mask processing. A hybrid OPC approach allowing localized ILT usage is presented in order to optimize both quality and runtime. A real mask is prepared and fabricated with this method. Finally, results analyzed on silicon are presented to compare localized ILT to reference dense OPC.

  9. Sub-0.35-μm i-line lithography with new advanced bottom antireflective coatings optimized for high-topography and dual-damascene applications

    NASA Astrophysics Data System (ADS)

    Deshpande, Shreeram V.; Brakensiek, Nickolas L.; Williams, Paul; Nowak, Kelly A.; Fowler, Shelly

    2001-04-01

    This paper describes the development of a new conformal i- line BARC. With the advent of flash memory deices the topography can be greater than 0.5 micrometers . Maintaining CD control through the BARC etch step over such a high topography can be a challenge. In order to meet these needs, Brewer Science has developed a highly conformal, spin bowl compatible BARC with increased baseline etch rate. This new BARC exhibits excellent coverage on high topographies and thus reduces the need for over-etch due to its conformality , and also increase the throughput due to its higher etch rate. As the circuit density on the chip increases copper is being implemented as the metal of choice for interconnects to reduce line resistance in semiconductor devices. This paper also describes the development of an organic BARC for applications in dual damascene processing. Via first dual damascene processes used for copper integration requires materials which can provide anti-reflection properties as well as act as etch blocks by filling the vias. The dual damascene BARC reported in this paper exhibits excellent via fill properties to reduce resist thickness variations as well as provide anti-reflective and via etch block properties. This paper outlines the design, development, and performance characterization of the new i-line BARC platforms for both high topography as well as dual damascene applications in sub 0.35 (Mu) m i-line lithography.

  10. Implementation and benefits of advanced process control for lithography CD and overlay

    NASA Astrophysics Data System (ADS)

    Zavyalova, Lena; Fu, Chong-Cheng; Seligman, Gary S.; Tapp, Perry A.; Pol, Victor

    2003-05-01

    Due to the rapidly reduced imaging process windows and increasingly stingent device overlay requirements, sub-130 nm lithography processes are more severely impacted than ever by systamic fault. Limits on critical dimensions (CD) and overlay capability further challenge the operational effectiveness of a mix-and-match environment using multiple lithography tools, as such mode additionally consumes the available error budgets. Therefore, a focus on advanced process control (APC) methodologies is key to gaining control in the lithographic modules for critical device levels, which in turn translates to accelerated yield learning, achieving time-to-market lead, and ultimately a higher return on investment. This paper describes the implementation and unique challenges of a closed-loop CD and overlay control solution in high voume manufacturing of leading edge devices. A particular emphasis has been placed on developing a flexible APC application capable of managing a wide range of control aspects such as process and tool drifts, single and multiple lot excursions, referential overlay control, 'special lot' handling, advanced model hierarchy, and automatic model seeding. Specific integration cases, including the multiple-reticle complementary phase shift lithography process, are discussed. A continuous improvement in the overlay and CD Cpk performance as well as the rework rate has been observed through the implementation of this system, and the results are studied.

  11. Mask characterization for CDU budget breakdown in advanced EUV lithography

    NASA Astrophysics Data System (ADS)

    Nikolsky, Peter; Strolenberg, Chris; Nielsen, Rasmus; Nooitgedacht, Tjitte; Davydova, Natalia; Yang, Greg; Lee, Shawn; Park, Chang-Min; Kim, Insung; Yeo, Jeong-Ho

    2012-11-01

    As the ITRS Critical Dimension Uniformity (CDU) specification shrinks, semiconductor companies need to maintain a high yield of good wafers per day and a high performance (and hence market value) of finished products. This cannot be achieved without continuous analysis and improvement of on-product CDU as one of the main drivers for process control and optimization with better understanding of main contributors from the litho cluster: mask, process, metrology and scanner. In this paper we will demonstrate a study of mask CDU characterization and its impact on CDU Budget Breakdown (CDU BB) performed for an advanced EUV lithography with 1D and 2D feature cases. We will show that this CDU contributor is one of the main differentiators between well-known ArFi and new EUV CDU budgeting principles. We found that reticle contribution to intrafield CDU should be characterized in a specific way: mask absorber thickness fingerprints play a role comparable with reticle CDU in the total reticle part of the CDU budget. Wafer CD fingerprints, introduced by this contributor, may or may not compensate variations of mask CD's and hence influence on total mask impact on intrafield CDU at the wafer level. This will be shown on 1D and 2D feature examples in this paper. Also mask stack reflectivity variations should be taken into account: these fingerprints have visible impact on intrafield CDs at the wafer level and should be considered as another contributor to the reticle part of EUV CDU budget. We observed also MEEF-through-field fingerprints in the studied EUV cases. Variations of MEEF may also play a role for the total intrafield CDU and may be taken into account for EUV Lithography. We characterized MEEF-through-field for the reviewed features, the results to be discussed in our paper, but further analysis of this phenomenon is required. This comprehensive approach to characterization of the mask part of EUV CDU characterization delivers an accurate and integral CDU Budget

  12. Applications of nanoimprint lithography/hot embossing: a review

    NASA Astrophysics Data System (ADS)

    Chen, Yifang

    2015-11-01

    This review concentrates on the applications of nanoimprint lithography (NIL) and hot embossing for the fabrications of nanolectronic devices, nanophotonic metamaterials and other nanostructures. Technical challenges and solutions in NIL such as nanofabrication of templates, removal of residual resist, pattern displacement in thermal NIL arising from thermal expansion are first discussed. In the nanofabrication of templates, dry etch in plasma for the formation of multi-step structures and ultra-sharp tip arrays in silicon, nanophotonic chiral structures with high aspect ratio in SiC are demonstrated. A bilayer technique for nondestructive removal of residual resist in thermal NIL is described. This process is successfully applied for the fabrication of T-shape gates and functional high electron mobility transistors. However, pattern displacement intrinsically existing in thermal NIL/hot embossing owing to different thermal expansions in the template and substrate, respectively, limits its further development and scale-up. Low temperature even room temperature NIL (RTNIL) was then proposed on HSQ, trying to eliminate the pattern distortion by avoiding a thermal loop in the imprint. But, considerable pressure needed in RTNIL turned the major attentions to the development of UV-curing NIL in UV-curable monomers at low temperature. A big variety of applications by low-temperature UV-curing NIL in SU-8 are described, including high-aspect-ratio phase gratings, tagging technology by nanobarcode for DNA sequencing, nanofluidic channels, nanophotonic metamaterials and biosensors. Hot embossing, as a parallel technique to NIL, was also developed, and its applications on ferroelectric polymers as well as metals are reviewed. Therefore, it is necessary to emphasize that this review is mainly attempted to review the applications of NIL/embossing instead of NIL technique advances.

  13. Hybrid inverse lithography techniques for advanced hierarchical memories

    NASA Astrophysics Data System (ADS)

    Xiao, Guangming; Hooker, Kevin; Irby, Dave; Zhang, Yunqiang; Ward, Brian; Cecil, Tom; Hall, Brett; Lee, Mindy; Kim, Dave; Lucas, Kevin

    2014-03-01

    Traditional segment-based model-based OPC methods have been the mainstream mask layout optimization techniques in volume production for memory and embedded memory devices for many device generations. These techniques have been continually optimized over time to meet the ever increasing difficulties of memory and memory periphery patterning. There are a range of difficult issues for patterning embedded memories successfully. These difficulties include the need for a very high level of symmetry and consistency (both within memory cells themselves and between cells) due to circuit effects such as noise margin requirements in SRAMs. Memory cells and access structures consume a large percentage of area in embedded devices so there is a very high return from shrinking the cell area as much as possible. This aggressive scaling leads to very difficult resolution, 2D CD control and process window requirements. Additionally, the range of interactions between mask synthesis corrections of neighboring areas can extend well beyond the size of the memory cell, making it difficult to fully take advantage of the inherent designed cell hierarchy in mask pattern optimization. This is especially true for non-traditional (i.e., less dependent on geometric rule) OPC/RET methods such as inverse lithography techniques (ILT) which inherently have more model-based decisions in their optimizations. New inverse methods such as model-based SRAF placement and ILT are, however, well known to have considerable benefits in finding flexible mask pattern solutions to improve process window, improve 2D CD control, and improve resolution in ultra-dense memory patterns. They also are known to reduce recipe complexity and provide native MRC compliant mask pattern solutions. Unfortunately, ILT is also known to be several times slower than traditional OPC methods due to the increased computational lithographic optimizations it performs. In this paper, we describe and present results for a methodology to

  14. Metallic nanodot arrays by stencil lithography for plasmonic biosensing applications.

    PubMed

    Vazquez-Mena, Oscar; Sannomiya, Takumi; Villanueva, Luis G; Voros, Janos; Brugger, Juergen

    2011-02-22

    The fabrication of gold nanodots by stencil lithography and its application for optical biosensing based on localized surface plasmon resonance are presented. Arrays of 50-200 nm wide nanodots with different spacing of 50-300 nm are fabricated without any resist, etching, or lift-off process. The dimensions and morphology of the nanodots were characterized by scanning electron and atomic force microscopy. The fabricated nanodots showed localized surface plasmon resonance in their extinction spectra in the visible range. The resonance wavelength depends on the periodicity and dimensions of the nanodots. Bulk refractive index measurements and model biosensing of streptavidin were successfully performed based on the plasmon resonance shift induced by local refractive index change when biomolecules are adsorbed on the nanodots. These results demonstrate the potential of stencil lithography for the realization of plasmon-based biosensing devices. PMID:21192666

  15. 3D nanostructures fabricated by advanced stencil lithography

    NASA Astrophysics Data System (ADS)

    Yesilkoy, F.; Flauraud, V.; Rüegg, M.; Kim, B. J.; Brugger, J.

    2016-02-01

    This letter reports on a novel fabrication method for 3D metal nanostructures using high-throughput nanostencil lithography. Aperture clogging, which occurs on the stencil membranes during physical vapor deposition, is leveraged to create complex topographies on the nanoscale. The precision of the 3D nanofabrication method is studied in terms of geometric parameters and material types. The versatility of the technique is demonstrated by various symmetric and chiral patterns made of Al and Au.

  16. 3D nanostructures fabricated by advanced stencil lithography.

    PubMed

    Yesilkoy, F; Flauraud, V; Rüegg, M; Kim, B J; Brugger, J

    2016-03-01

    This letter reports on a novel fabrication method for 3D metal nanostructures using high-throughput nanostencil lithography. Aperture clogging, which occurs on the stencil membranes during physical vapor deposition, is leveraged to create complex topographies on the nanoscale. The precision of the 3D nanofabrication method is studied in terms of geometric parameters and material types. The versatility of the technique is demonstrated by various symmetric and chiral patterns made of Al and Au. PMID:26884085

  17. Advanced metrology for the 14 nm node double patterning lithography

    NASA Astrophysics Data System (ADS)

    Carau, D.; Bouyssou, R.; Dezauzier, C.; Besacier, M.; Gourgon, C.

    2014-05-01

    In microelectronics the two crucial parameters for the lithography step are the critical dimension, which is the width of the smallest printable pattern, and the misalignment error of the reticle, called overlay. For the 14 nm node, the limit of scanner resolution can be overcome by the double patterning technique, which requires a maximum overlay error between the two reticles of 3 nm [1]. The current approach in the measurements of critical dimension and overlay is to treat them separately, but it has become much more complex in the double patterning context, since they are no longer independent. In this paper, a strategy of a common measurement is developed. The aim of the strategy is to measure simultaneously overlay and critical dimension in the metal level double patterning grating before the second etch process. The scatterometry technique is well known for critical dimension measurement. This study demonstrates that the overlay between the two gratings can also be deduced. Thanks to this original scatterometry-based method, it becomes possible to provide information on the lithography step quality before the second etch process; therefore the lithography can be reworked if it is necessary.

  18. Programmable lithography engine (ProLE) grid-type supercomputer and its applications

    NASA Astrophysics Data System (ADS)

    Petersen, John S.; Maslow, Mark J.; Gerold, David J.; Greenway, Robert T.

    2003-06-01

    There are many variables that can affect lithographic dependent device yield. Because of this, it is not enough to make optical proximity corrections (OPC) based on the mask type, wavelength, lens, illumination-type and coherence. Resist chemistry and physics along with substrate, exposure, and all post-exposure processing must be considered too. Only a holistic approach to finding imaging solutions will accelerate yield and maximize performance. Since experiments are too costly in both time and money, accomplishing this takes massive amounts of accurate simulation capability. Our solution is to create a workbench that has a set of advanced user applications that utilize best-in-class simulator engines for solving litho-related DFM problems using distributive computing. Our product, ProLE (Programmable Lithography Engine), is an integrated system that combines Petersen Advanced Lithography Inc."s (PAL"s) proprietary applications and cluster management software wrapped around commercial software engines, along with optional commercial hardware and software. It uses the most rigorous lithography simulation engines to solve deep sub-wavelength imaging problems accurately and at speeds that are several orders of magnitude faster than current methods. Specifically, ProLE uses full vector thin-mask aerial image models or when needed, full across source 3D electromagnetic field simulation to make accurate aerial image predictions along with calibrated resist models;. The ProLE workstation from Petersen Advanced Lithography, Inc., is the first commercial product that makes it possible to do these intensive calculations at a fraction of a time previously available thus significantly reducing time to market for advance technology devices. In this work, ProLE is introduced, through model comparison to show why vector imaging and rigorous resist models work better than other less rigorous models, then some applications of that use our distributive computing solution are shown

  19. Advanced electric-field scanning probe lithography on molecular resist using active cantilever

    NASA Astrophysics Data System (ADS)

    Kaestner, Marcus; Aydogan, Cemal; Lipowicz, Hubert-Seweryn; Ivanov, Tzvetan; Lenk, Steve; Ahmad, Ahmad; Angelov, Tihomir; Reum, Alexander; Ishchuk, Valentyn; Atanasov, Ivaylo; Krivoshapkina, Yana; Hofer, Manuel; Holz, Mathias; Rangelow, Ivo W.

    2015-03-01

    The routine "on demand" fabrication of features smaller than 10 nm opens up new possibilities for the realization of many novel nanoelectronic, NEMS, optical and bio-nanotechnology-based devices. Based on the thermally actuated, piezoresistive cantilever technology we have developed a first prototype of a scanning probe lithography (SPL) platform able to image, inspect, align and pattern features down to single digit nano regime. The direct, mask-less patterning of molecular resists using active scanning probes represents a promising path circumventing the problems in today's radiation-based lithography. Here, we present examples of practical applications of the previously published electric field based, current-controlled scanning probe lithography on molecular glass resist calixarene by using the developed tabletop SPL system. We demonstrate the application of a step-and-repeat scanning probe lithography scheme including optical as well as AFM based alignment and navigation. In addition, sequential read-write cycle patterning combining positive and negative tone lithography is shown. We are presenting patterning over larger areas (80 x 80 μm) and feature the practical applicability of the lithographic processes.

  20. Lithography application of a novel photoresist for patterning of cells.

    PubMed

    He, Wei; Halberstadt, Craig R; Gonsalves, Kenneth E

    2004-05-01

    Photolithography is the current workhorse for the microelectronic industry. It has been used extensively for the creation of patterns on two-dimensional surfaces. Various research groups have studied the use of photolithography to pattern surfaces for the alignment of cells. So far, these applications have been limited due to the use of organic solvents in the pattern developing process, which can denature biomacromolecules that would be attached to the material. To address this problem, a novel bioactive photoresist (bioresist) based on the copolymer of methyl methacrylate and 3-(t-butoxycarbonyl)-N-vinyl-2-pyrrolidone (MMA:TBNVP) was prepared and in vitro fibroblast cell growth on this resist was studied. Results demonstrated that the resist is non-adhesive to the fibroblast cells. By deprotecting the t-BOC groups into carboxyl groups (MMA:D-TBNVP), the material became cell adhesive. Furthermore, cells were able to proliferate on the MMA:D-TBNVP surface. By culturing cells on the MMA:D-TBNVP surface in serum versus serum-free medium, we reached the conclusion that the chemistry of the deprotected copolymer indirectly promoted cell attachment through its absorbance of serum proteins on the material. Patterns of 25 microm x 25 microm lines were obtained by chemically manipulating the surface of the photoresist using UV lithography without any solvent development. Fibroblast cells were observed to align on the patterned surface. This resist could be a suitable candidate to improve the application of conventional lithography in direct protein patterning for the guided growth of cells.

  1. Workshop on compact storage ring technology: applications to lithography

    SciTech Connect

    Not Available

    1986-05-30

    Project planning in the area of x-ray lithography is discussed. Three technologies that are emphasized are the light source, the lithographic technology, and masking technology. The needs of the semiconductor industry in the lithography area during the next decade are discussed, particularly as regards large scale production of high density dynamic random access memory devices. Storage ring parameters and an overall exposure tool for x-ray lithography are addressed. Competition in this area of technology from Germany and Japan is discussed briefly. The design of a storage ring is considered, including lattice design, magnets, and beam injection systems. (LEW)

  2. Advanced 0.3-NA EUV lithography capabilities at the ALS

    SciTech Connect

    Naulleau, Patrick; Anderson, Erik; Dean, Kim; Denham, Paul; Goldberg, Kenneth A.; Hoef, Brian; Jackson, Keith

    2005-07-07

    For volume nanoelectronics production using Extreme ultraviolet (EUV) lithography [1] to become a reality around the year 2011, advanced EUV research tools are required today. Microfield exposure tools have played a vital role in the early development of EUV lithography [2-4] concentrating on numerical apertures (NA) of 0.2 and smaller. Expected to enter production at the 32-nm node with NAs of 0.25, EUV can no longer rely on these early research tools to provide relevant learning. To overcome this problem, a new generation of microfield exposure tools, operating at an NA of 0.3 have been developed [5-8]. Like their predecessors, these tools trade off field size and speed for greatly reduced complexity. One of these tools is implemented at Lawrence Berkeley National Laboratory's Advanced Light Source synchrotron radiation facility. This tool gets around the problem of the intrinsically high coherence of the synchrotron source [9,10] by using an active illuminator scheme [11]. Here we describe recent printing results obtained from the Berkeley EUV exposure tool. Limited by the availability of ultra-high resolution chemically amplified resists, present resolution limits are approximately 32 nm for equal lines and spaces and 27 nm for semi-isolated lines.

  3. Nanoimprint lithography for nanodevice fabrication

    NASA Astrophysics Data System (ADS)

    Barcelo, Steven; Li, Zhiyong

    2016-09-01

    Nanoimprint lithography (NIL) is a compelling technique for low cost nanoscale device fabrication. The precise and repeatable replication of nanoscale patterns from a single high resolution patterning step makes the NIL technique much more versatile than other expensive techniques such as e-beam or even helium ion beam lithography. Furthermore, the use of mechanical deformation during the NIL process enables grayscale lithography with only a single patterning step, not achievable with any other conventional lithography techniques. These strengths enable the fabrication of unique nanoscale devices by NIL for a variety of applications including optics, plasmonics and even biotechnology. Recent advances in throughput and yield in NIL processes demonstrate the potential of being adopted for mainstream semiconductor device fabrication as well.

  4. 4-Nitrobenzene Grafted in Porous Silicon: Application to Optical Lithography

    NASA Astrophysics Data System (ADS)

    Tiddia, Mariavitalia; Mula, Guido; Sechi, Elisa; Vacca, Annalisa; Cara, Eleonora; De Leo, Natascia; Fretto, Matteo; Boarino, Luca

    2016-09-01

    In this work, we report a method to process porous silicon to improve its chemical resistance to alkaline solution attacks based on the functionalization of the pore surface by the electrochemical reduction of 4-nitrobenzendiazonium salt. This method provides porous silicon with strong resistance to the etching solutions used in optical lithography and allows the fabrication of tailored metallic contacts on its surface. The samples were studied by chemical, electrochemical, and morphological methods. We demonstrate that the grafted samples show a resistance to harsh alkaline solution more than three orders of magnitude larger than that of pristine porous silicon, being mostly unmodified after about 40 min. The samples maintained open pores after the grafting, making them suitable for further treatments like filling by polymers. Optical lithography was performed on the functionalized samples, and electrochemical characterization results are shown.

  5. 4-Nitrobenzene Grafted in Porous Silicon: Application to Optical Lithography.

    PubMed

    Tiddia, Mariavitalia; Mula, Guido; Sechi, Elisa; Vacca, Annalisa; Cara, Eleonora; De Leo, Natascia; Fretto, Matteo; Boarino, Luca

    2016-12-01

    In this work, we report a method to process porous silicon to improve its chemical resistance to alkaline solution attacks based on the functionalization of the pore surface by the electrochemical reduction of 4-nitrobenzendiazonium salt. This method provides porous silicon with strong resistance to the etching solutions used in optical lithography and allows the fabrication of tailored metallic contacts on its surface. The samples were studied by chemical, electrochemical, and morphological methods. We demonstrate that the grafted samples show a resistance to harsh alkaline solution more than three orders of magnitude larger than that of pristine porous silicon, being mostly unmodified after about 40 min. The samples maintained open pores after the grafting, making them suitable for further treatments like filling by polymers. Optical lithography was performed on the functionalized samples, and electrochemical characterization results are shown. PMID:27686091

  6. Advanced in-situ electron-beam lithography for deterministic nanophotonic device processing.

    PubMed

    Kaganskiy, Arsenty; Gschrey, Manuel; Schlehahn, Alexander; Schmidt, Ronny; Schulze, Jan-Hindrik; Heindel, Tobias; Strittmatter, André; Rodt, Sven; Reitzenstein, Stephan

    2015-07-01

    We report on an advanced in-situ electron-beam lithography technique based on high-resolution cathodoluminescence (CL) spectroscopy at low temperatures. The technique has been developed for the deterministic fabrication and quantitative evaluation of nanophotonic structures. It is of particular interest for the realization and optimization of non-classical light sources which require the pre-selection of single quantum dots (QDs) with very specific emission features. The two-step electron-beam lithography process comprises (a) the detailed optical study and selection of target QDs by means of CL-spectroscopy and (b) the precise retrieval of the locations and integration of target QDs into lithographically defined nanostructures. Our technology platform allows for a detailed pre-process determination of important optical and quantum optical properties of the QDs, such as the emission energies of excitonic complexes, the excitonic fine-structure splitting, the carrier dynamics, and the quantum nature of emission. In addition, it enables a direct and precise comparison of the optical properties of a single QD before and after integration which is very beneficial for the quantitative evaluation of cavity-enhanced quantum devices. PMID:26233395

  7. Advanced in-situ electron-beam lithography for deterministic nanophotonic device processing

    SciTech Connect

    Kaganskiy, Arsenty; Gschrey, Manuel; Schlehahn, Alexander; Schmidt, Ronny; Schulze, Jan-Hindrik; Heindel, Tobias; Rodt, Sven Reitzenstein, Stephan; Strittmatter, André

    2015-07-15

    We report on an advanced in-situ electron-beam lithography technique based on high-resolution cathodoluminescence (CL) spectroscopy at low temperatures. The technique has been developed for the deterministic fabrication and quantitative evaluation of nanophotonic structures. It is of particular interest for the realization and optimization of non-classical light sources which require the pre-selection of single quantum dots (QDs) with very specific emission features. The two-step electron-beam lithography process comprises (a) the detailed optical study and selection of target QDs by means of CL-spectroscopy and (b) the precise retrieval of the locations and integration of target QDs into lithographically defined nanostructures. Our technology platform allows for a detailed pre-process determination of important optical and quantum optical properties of the QDs, such as the emission energies of excitonic complexes, the excitonic fine-structure splitting, the carrier dynamics, and the quantum nature of emission. In addition, it enables a direct and precise comparison of the optical properties of a single QD before and after integration which is very beneficial for the quantitative evaluation of cavity-enhanced quantum devices.

  8. Advanced in-situ electron-beam lithography for deterministic nanophotonic device processing

    NASA Astrophysics Data System (ADS)

    Kaganskiy, Arsenty; Gschrey, Manuel; Schlehahn, Alexander; Schmidt, Ronny; Schulze, Jan-Hindrik; Heindel, Tobias; Strittmatter, André; Rodt, Sven; Reitzenstein, Stephan

    2015-07-01

    We report on an advanced in-situ electron-beam lithography technique based on high-resolution cathodoluminescence (CL) spectroscopy at low temperatures. The technique has been developed for the deterministic fabrication and quantitative evaluation of nanophotonic structures. It is of particular interest for the realization and optimization of non-classical light sources which require the pre-selection of single quantum dots (QDs) with very specific emission features. The two-step electron-beam lithography process comprises (a) the detailed optical study and selection of target QDs by means of CL-spectroscopy and (b) the precise retrieval of the locations and integration of target QDs into lithographically defined nanostructures. Our technology platform allows for a detailed pre-process determination of important optical and quantum optical properties of the QDs, such as the emission energies of excitonic complexes, the excitonic fine-structure splitting, the carrier dynamics, and the quantum nature of emission. In addition, it enables a direct and precise comparison of the optical properties of a single QD before and after integration which is very beneficial for the quantitative evaluation of cavity-enhanced quantum devices.

  9. Advances in maskless and mask-based optical lithography on plastic flexible substrates

    NASA Astrophysics Data System (ADS)

    Barbu, Ionut; Ivan, Marius G.; Giesen, Peter; Van de Moosdijk, Michel; Meinders, Erwin R.

    2009-12-01

    Organic flexible electronics is an emerging technology with huge potential growth in the future which is likely to open up a complete new series of potential applications such as flexible OLED-based displays, urban commercial signage, and flexible electronic paper. The transistor is the fundamental building block of all these applications. A key challenge in patterning transistors on flexible plastic substrates stems from the in-plane nonlinear deformations as a consequence of foil expansion/shrinkage, moisture uptake, baking etc. during various processing steps. Optical maskless lithography is one of the potential candidates for compensating for these foil distortions by in-situ adjustment prior to exposure of the new layer image with respect to the already patterned layers. Maskless lithography also brings the added value of reducing the cost-of-ownership related to traditional mask-based tools by eliminating the need for expensive masks. For the purpose of this paper, single-layer maskless exposures at 355 nm were performed on gold-coated poly(ethylenenaphthalate) (PEN) flexible substrates temporarily attached to rigid carriers to ensure dimensional stability during processing. Two positive photoresists were employed for this study and the results on plastic foils were benchmarked against maskless as well as mask-based (ASML PAS 5500/100D stepper) exposures on silicon wafers.

  10. Capillary force lithography: the versatility of this facile approach in developing nanoscale applications

    NASA Astrophysics Data System (ADS)

    Ho, Dominic; Zou, Jianli; Zdyrko, Bogdan; Iyer, K. Swaminathan; Luzinov, Igor

    2014-12-01

    Since its inception as a simple, low cost alternative to more complicated lithographic techniques such as electron-beam and dip-pen lithography, capillary force lithography (CFL) has developed into a versatile tool to form sub-100 nm patterns. Utilizing the concept of a polymer melt, structures and devices generated by the technique have been used in applications varying from surfaces regulating cell growth to gas sensing. In this review, we discuss various CFL methodologies which have evolved, their application in both biological and non-biological research, and finally a brief outlook in areas of research where CFL is destined to make an enormous impact in the near future.

  11. Application of SMIF isolation to lithography processes for contamination control

    NASA Astrophysics Data System (ADS)

    Zhu, Sheng-Bai

    2001-08-01

    Contamination control is particularly important in lithography processes because pattern defects are converted to wafers after each exposure. Contamination, by definition, is undesired matter or energy, which causes product defects or process instabilities, and, consequently, reduces yield and reliability. In lithography processes, particles, condensable hydrocarbosn, base molecules, moisture, and static electricity are examples of contaminants. Particles are inert minute objects, which interfere with the proper formation of circuit features. Condensable hydrocarbosn may cause optics hazing which reduces image homogeneity and energy transmission. Some Chemically Amplified Resists (CAR) are susceptible to molecular base contamination, resulting in image degradation such as T-topping. Moisture can affect the characteristics of photoresist, destabilizing photo-exposure and development processes. In combination with water, amine containing photoresist strippers can form hydroxyl ions that can attack aluminum and aluminum-copper alloys. Charged surfaces can tract and hold contaminants of opposite polarity. In case the electrical field exceeds the dielectric strength, ESD event occurs, often accompanied with damage of reticles, masks, or wafer circuits. With SMIF isolation technologies, yield loss due to defects and/or instabilities is minimized. Reticles, masks, and wafers are isolated form contamination sources through hermetic seal, in conjunction with particle/chemical filtration, and static shielding. Pressurization, inert gas purge, chemical absorbents, and electric grounding or air ionization are techniques of removing contaminants from the critical areas. For best performance, adequate selection of construction materials is critical. This paper discusses impacts of contamination on lithography processes and the possibility of solving such problems using SMIF isolation techniques. Theoretical models are developed and experimental data are presented.

  12. Nanofabrication of Optical Elements for SXR and EUV Applications: Ion Beam Lithography as a New Approach

    SciTech Connect

    Lenz, J.; Krupp, N.; Irsen, S.; Wilhein, T.

    2011-09-09

    Diffractive optical elements are important components for applications in soft x-ray and extreme ultraviolet radiation. At present, the standard fabrication method for such optics is based on electron beam lithography followed by nanostructuring. This requires a series of complex processes including exposure, reactive ion-etching, and electro-plating. We report on experiments showing the single-step fabrication of such elements using ion beam lithography. Both transmission and reflection gratings were fabricated and successfully implemented as spectrometers at laboratory soft x-ray sources. Additionally, first steps toward zone plate fabrication are described.

  13. Electron-beam lithography for micro and nano-optical applications

    NASA Technical Reports Server (NTRS)

    Wilson, Daniel W.; Muller, Richard E.; Echternach, Pierre M.

    2005-01-01

    Direct-write electron-beam lithography has proven to be a powerful technique for fabricating a variety of micro- and nano-optical devices. Binary E-beam lithography is the workhorse technique for fabricating optical devices that require complicated precision nano-scale features. We describe a bi-layer resist system and virtual-mark height measurement for improving the reliability of fabricating binary patterns. Analog E-beam lithography is a newer technique that has found significant application in the fabrication of diffractive optical elements. We describe our techniques for fabricating analog surface-relief profiles in E-beam resist, including some discussion regarding overcoming the problems of resist heating and charging. We also describe a multiple-field-size exposure scheme for suppression of field-stitch induced ghost diffraction orders produced by blazed diffraction gratings on non-flat substrates.

  14. On-wire lithography: synthesis, encoding and biological applications

    PubMed Central

    Banholzer, Matthew J; Qin, Lidong; Millstone, Jill E; Osberg, Kyle D; Mirkin, Chad A

    2014-01-01

    The next step in the maturing field of nanotechnology is to develop ways to introduce unusual architectural changes to simple building blocks. For nanowires, on-wire lithography (OWL) has emerged as a powerful way of synthesizing a segmented structure and subsequently introducing architectural changes through post-chemical treatment. In the OWL protocol presented here, multisegmented nanowires are grown and a support layer is deposited on one side of each nanostructure. After selective chemical etching of sacrificial segments, structures with gaps as small as 2 nm and disks as thin as 20 nm can be created. These nanostructures are highly tailorable and can be used in electrical transport, Raman enhancement and energy conversion. Such nanostructures can be functionalized with many types of adsorbates, enabling the use of OWL-generated structures as bioactive probes for diagnostic assays and molecular transport junctions. The process takes 13–36 h depending on the type of adsorbate used to functionalize the nanostructures. PMID:19444241

  15. Mask characterization for critical dimension uniformity budget breakdown in advanced extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Nikolsky, Peter; Strolenberg, Chris; Nielsen, Rasmus; Nooitgedacht, Tjitte; Davydova, Natalia; Yang, Greg; Lee, Shawn; Park, Chang-Min; Kim, Insung; Yeo, Jeong-Ho

    2013-04-01

    As the International Technology Roadmap for Semiconductors critical dimension uniformity (CDU) specification shrinks, semiconductor companies need to maintain a high yield of good wafers per day and high performance (and hence market value) of finished products. This cannot be achieved without continuous analysis and improvement of on-product CDU as one of the main drivers for process control and optimization with better understanding of main contributors from the litho cluster: mask, process, metrology and scanner. We will demonstrate a study of mask CDU characterization and its impact on CDU Budget Breakdown (CDU BB) performed for advanced extreme ultraviolet (EUV) lithography with 1D (dense lines) and 2D (dense contacts) feature cases. We will show that this CDU contributor is one of the main differentiators between well-known ArFi and new EUV CDU budgeting principles. We found that reticle contribution to intrafield CDU should be characterized in a specific way: mask absorber thickness fingerprints play a role comparable with reticle CDU in the total reticle part of the CDU budget. Wafer CD fingerprints, introduced by this contributor, may or may not compensate variations of mask CDs and hence influence on total mask impact on intrafield CDU at the wafer level. This will be shown on 1D and 2D feature examples. Mask stack reflectivity variations should also be taken into account: these fingerprints have visible impact on intrafield CDs at the wafer level and should be considered as another contributor to the reticle part of EUV CDU budget. We also observed mask error enhancement factor (MEEF) through field fingerprints in the studied EUV cases. Variations of MEEF may play a role towards the total intrafield CDU and may need to be taken into account for EUV lithography. We characterized MEEF-through-field for the reviewed features, with results herein, but further analysis of this phenomenon is required. This comprehensive approach to quantifying the mask part of

  16. A reliable higher power ArF laser with advanced functionality for immersion lithography

    NASA Astrophysics Data System (ADS)

    Kurosu, Akihiko; Nakano, Masaki; Yashiro, Masanori; Yoshino, Masaya; Tsushima, Hiroaki; Masuda, Hiroyuki; Kumazaki, Takahito; Matsumoto, Shinichi; Kakizaki, Kouji; Matsunaga, Takashi; Okazaki, Shinji; Fujimoto, Junichi; Mizoguchi, Hakaru

    2012-03-01

    193nm ArF eximer lasers are expected to continue to be the main solution in photolithography, since advanced lithography tecnologies such as Multiple patterning and Self-aligned double patterning (SADP) are being developed. In order to appliy these tecnologies to high-volume semiconductor manufactureing, the key is to contain chip manufactureing costs. Therefore, improvement on Reliability, Availability and Maintainability of ArF excimer lasers is important.[1] We works on improving productivity and reducing downtime of ArF exmer lasers, which leads to Reliability, Availability and Maintainability improvemnet. First in this paper, our focus drilling tecnique, which increases depth of focus (DoF) by spectral bandwidth tuning is introdueced. This focus drilling enables to increase DoF for isolated contact holes. and it not degrades the wafer stage speed.[2] Second, a technique which eables to reduce gas refill time to zero is introduced. This technique reduces downtime so Availavility is expected to improve. In this paper, we report these tecniques by using simulation resutls and partially experimental resutls provided by a semiconductor manufacturer.

  17. Inspection of advanced computational lithography logic reticles using a 193-nm inspection system

    NASA Astrophysics Data System (ADS)

    Yu, Ching-Fang; Lin, Mei-Chun; Lai, Mei-Tsu; Hsu, Luke T. H.; Chin, Angus; Lee, S. C.; Yen, Anthony; Wang, Jim; Chen, Ellison; Wu, David; Broadbent, William H.; Huang, William; Zhu, Zinggang

    2010-09-01

    We report inspection results of early 22-nm logic reticles designed with both conventional and computational lithography methods. Inspection is performed using a state-of-the-art 193-nm reticle inspection system in the reticleplane inspection mode (RPI) where both rule-based sensitivity control (RSC) and a newer modelbased sensitivity control (MSC) method are tested. The evaluation includes defect detection performance using several special test reticles designed with both conventional and computational lithography methods; the reticles contain a variety of programmed critical defects which are measured based on wafer print impact. Also included are inspection results from several full-field product reticles designed with both conventional and computational lithography methods to determine if low nuisance-defect counts can be achieved. These early reticles are largely single-die and all inspections are performed in the die-to-database inspection mode only.

  18. Coaxial Lithography

    NASA Astrophysics Data System (ADS)

    Ozel, Tuncay

    demonstrate the possibilities afforded by COAL. Chapter 5 addresses the use of COAL for the synthesis of solution dispersible metal nanorings and nanotubes with exceptional architectural tailorability of inner diameter, outer diameter, and length leading to precise spectral control over the resulting plasmonic fields ranging from visible to the near-IR. Chapter 6 is an outlook on templated electrochemical synthesis using coaxial lithography and highlights a few promising applications from nanoparticle assembly to light-matter interactions.

  19. Applications of laser lithography on oxide film to titanium micromachining

    NASA Astrophysics Data System (ADS)

    Chauvy, P.-F.; Hoffmann, P.; Landolt, D.

    2003-03-01

    Due to its good biocompatibility titanium is widely used for dental and orthopaedics implants and for biomedical microsystems. For these applications one needs specific micromachining methods. A new four-step method for electrochemical micromachining of titanium is presented here, which implies anodic oxidation, Excimer laser sensitising irradiation, anodic dissolution, and ultrasonic cleaning. The method is applied to the fabrication of two 3D model structures, surface structuring of a cylinder and machining of a complex two-level architecture. The absence of debris and of a heat affected zone as well as the resulting surface smoothness are the main advantages of the process. Ways to improve the still limited processing speed are discussed with regards to potential applications.

  20. AltPSM contact hole application at DRAM 4xnm nodes with dry 193nm lithography

    NASA Astrophysics Data System (ADS)

    Noelscher, Christoph; Henkel, Thomas; Jauzion-Graverolle, Franck; Hennig, Mario; Morgana, Nicolo; Schlief, Ralph; Moukara, Molela; Koehle, Roderick; Neubauer, Ralf

    2008-03-01

    To avoid expensive immersion lithography and to further use existing dry tools for critical contact layer lithography at 4Xnm DRAM nodes the application of altPSM is investigated and compared to attPSM. Simulations and experiments with several test masks showed that by use of altPSM with suitable 0°/180° coloring and assist placement 30nm smaller contacts can be resolved through pitch with sufficient process windows (PW). This holds for arrays of contacts with variable lengths through short and long side pitches. A further benefit is the lower mask error enhancement factor (MEEF). Nevertheless 3D mask errors (ME) consume benefits in the PW and the assist placement and coloring of the main features (MF) put some constraints on the chip design. An altPSM compatible 4Xnm full-chip layout was realized without loss of chip area. Mask making showed very convincing results with respect to CDU, etch depth uniformity and defectiveness. The printed intra-field CD uniformity was comparable to attPSM despite the smaller target CDs. Room for improvement is identified in OPC accuracy and in automatic assist placement and sizing.

  1. Synthesis and characterization of a photosensitive polyimide precursor and its photocuring behavior for lithography applications

    NASA Astrophysics Data System (ADS)

    Nguyen, Le Thu T.; Nguyen, Huu Nieu; La, Thai Ha T.

    2007-02-01

    Photosensitive polyimide (PSPI) is of great interest, especially in microelectronic industry and potentially in the photonics and MEMS applications. Here we report on our studies for optimization of synthesis conditions for a PSPI which can be used in lithography. The direct polymerization method using phenyl phosphonic dichloride (PPD) as an activator was used to synthesize poly(amic ester) (PAE) from pyromellitic dianhydride (PMDA), 4,4'-oxydianiline (ODA) and 2-hydroxyethylmethacrylate (HEMA). Main parameters of the synthesis procedure were investigated by differential scanning calorimetry (DSC) analyses. From that, synthesis conditions were determined. Characteristics of the synthesized PAE and the imidized film were studied by the means of DSC, thermalgravimetric analyses (TGA) and Fourier transform infrared spectroscopy (FTIR). The glass transition temperature and the thermal stability of the imidized film were determined. Additionally, formulations of photo-PAE and the Irgacure 369 as photoinitiator were prepared and photocuring was tested by lithography. The results show that the images can be transferred to the PAE film by selective exposure.

  2. Step and flash imprint lithography template fabrication for emerging market applications

    NASA Astrophysics Data System (ADS)

    Resnick, Douglas J.; Schmid, Gerard; Miller, Mike; Doyle, Gary; Jones, Chris; LaBrake, Dwayne

    2007-05-01

    The Step and Flash Imprint Lithography (S-FIL TM) process uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning for applications where high-resolution mix-and-match overlay is desired. Several applications, including patterned media, photonic crystals and wire grid polarizers, are better served by a patterning process that prints the full wafer since alignment requirements are not so stringent. In this paper, a methodology for creating high resolution thin templates for full wafer (or disk) imprinting is described. The methods have been applied toward the imprinting of both photonic crystal and patterned media devices using a large area printing tool developed around the S-FIL process.

  3. Electroplated porous polypyrrole nanostructures patterned by colloidal lithography for drug-delivery applications.

    PubMed

    Pokki, J; Ergeneman, O; Sivaraman, K M; Ozkale, B; Zeeshan, M A; Lühmann, T; Nelson, B J; Pané, S

    2012-05-21

    Porous nanostructures of polypyrrole (Ppy) were fabricated using colloidal lithography and electrochemical techniques for potential applications in drug delivery. A sequential fabrication method was developed and optimized to maximize the coverage of the Ppy nanostructures and to obtain a homogeneous layer over the substrate. This was realized by masking with electrophoretically-assembled polystyrene (PS) nanospheres and then electroplating. Drug/biomolecule adsorption and the release characteristics for the porous nanostructures of Ppy were investigated using rhodamine B (Rh-B). Rh-B is an easily detectable small hydrophobic molecule that is used as a model for many drugs or biological substances. The porous Ppy nanostructures with an enhanced surface area exhibited higher Rh-B loading capacity than bulk planar films of Ppy. Moreover, tunability of surface morphology for further applications (e.g., sensing, cell adhesion) was demonstrated.

  4. Advanced Welding Applications

    NASA Technical Reports Server (NTRS)

    Ding, Robert J.

    2010-01-01

    Some of the applications of advanced welding techniques are shown in this poster presentation. Included are brief explanations of the use on the Ares I and Ares V launch vehicle and on the Space Shuttle Launch vehicle. Also included are microstructural views from four advanced welding techniques: Variable Polarity Plasma Arc (VPPA) weld (fusion), self-reacting friction stir welding (SR-FSW), conventional FSW, and Tube Socket Weld (TSW) on aluminum.

  5. The DARPA compact superconducting x-ray lithography source features. [Defense Advanced Research Projects Agency (DARPA)

    SciTech Connect

    Heese, R. ); Kalsi, S. ); Leung, E. . Space Systems Div.)

    1991-01-01

    Under DARPA sponsorship, a compact Superconducting X-ray Lithography Source (SXLS) is being designed and built by the Brookhaven National Laboratory (BNL) with industry participation from Grumman Corporation and General Dynamics. This source is optimized for lithography work for sub-micron high density computer chips, and is about the size of a billiard table (1.5 m {times} 4.0 m). The machine has a racetrack configuration with two 180{degree} bending magnets being designed and built by General Dynamics under a subcontract with Grumman Corporation. The machine will have 18 photon ports which would deliver light peaked at a wave length of 10 Angstroms. Grumman is commercializing the SXLS device and plans to book orders for delivery of industrialized SXLS (ISXLS) versions in 1995. This paper will describe the major features of this device. The commercial machine will be equipped with a fully automated user-friendly control systems, major features of which are already working on a compact warm dipole ring at BNL. This ring has normal dipole magnets with dimensions identical to the SXLS device, and has been successfully commissioned. 4 figs., 1 tab.

  6. Characterization of optical material parameters for EUV Lithography applications at PTB

    NASA Astrophysics Data System (ADS)

    Laubis, Christian; Haase, Anton; Soltwisch, Victor; Scholze, Frank

    2015-09-01

    EUV Lithography now reaches the fab floor. The technology ramp up and integration with existing processes will require evolutionary steps in many aspects of the technology. For instance will it be necessary to reduce 3D mask effects like shadowing e.g. by introducing a thinner absorber structure. Continuous progress will be based on using new materials, adapted multilayers, and new reticle designs. Many of these developments are based on simulations and computer models for the design of the required structures and thus require data on the optical properties of the materials involved. In particular when addressing the reticle where the optical function is the target value. Using its more than 25 years of expertise in EUV metrology1, PTB operates instrumentation for reflectometry and scatterometry2 in the EUV and adjacent wavelength ranges and can provide the data for the determination of optical material parameters for individual thin layers. The need for sound optical parameter characterization for the development of alternative EUV materials was thoroughly motivated during the 2015 SPIE Advanced Lithography conference3. The data required is not readily available from databases, as thin film properties - depending on their deposition method and interfaces - may deviate significantly from standard bulk data4. Therefore, better optical constants and a continuous availability of the associated measurement tools are vital for further progress in EUV reticle and optical system design. The ability to vary relevant parameters like wavelength, angle of incidence (AOI), the plane of incidence and polarization is a prerequisite to gather sufficient data to model optical constants. We give details on PTB's measurement capabilities and accessible parameter space for optical material parameter characterization and show some representative data and results.

  7. Advanced mask technique to improve bit line CD uniformity of 90 nm node flash memory in low-k1 lithography

    NASA Astrophysics Data System (ADS)

    Kim, Jong-doo; Choi, Jae-young; Kim, Jea-hee; Han, Jae-won

    2008-10-01

    As devices size move toward 90nm technology node or below, defining uniform bit line CD of flash devices is one of the most challenging features to print in KrF lithography. There are two principal difficulties in defining bit line on wafer. One is insufficient process margin besides poor resolution compared with ArF lithography. The other is that asymmetric bit line should be made for OPC(Optical Proximity Correction) modeling. Therefore advanced ArF lithography scanner should be used for define bit line with RETs (Resolution Enhancement Techniques) such as immersion lithography, OPC, PSM(Phase Shift Mask), high NA(Numerical Aperture), OAI(Off-Axis Illumination), SRAF(Sub-resolution Assistant Feature), and mask biasing.. Like this, ArF lithography propose the method of enhancing resolution, however, we must spend an enormous amount of CoC(cost of ownership) to utilize ArF photolithography process than KrF. In this paper, we suggest method to improve of bit line CD uniformity, patterned by KrF lithographic process in 90nm sFlash(stand alone Flash) devices. We applied new scheme of mask manufacturing, which is able to realize 2 different types of mask, binary and phase-shift, into one plate. Finally, we could get the more uniform bit lines and we expect to get more stable properties then before applying this technique.

  8. High refractive index Fresnel lens on a fiber fabricated by nanoimprint lithography for immersion applications.

    PubMed

    Koshelev, Alexander; Calafiore, Giuseppe; Piña-Hernandez, Carlos; Allen, Frances I; Dhuey, Scott; Sassolini, Simone; Wong, Edward; Lum, Paul; Munechika, Keiko; Cabrini, Stefano

    2016-08-01

    In this Letter, we present a Fresnel lens fabricated on the end of an optical fiber. The lens is fabricated using nanoimprint lithography of a functional high refractive index material, which is suitable for mass production. The main advantage of the presented Fresnel lens compared to a conventional fiber lens is its high refractive index (n=1.68), which enables efficient light focusing even inside other media, such as water or an adhesive. Measurement of the lens performance in an immersion liquid (n=1.51) shows a near diffraction limited focal spot of 810 nm in diameter at the 1/e2 intensity level for a wavelength of 660 nm. Applications of such fiber lenses include integrated optics, optical trapping, and fiber probes.

  9. High refractive index Fresnel lens on a fiber fabricated by nanoimprint lithography for immersion applications

    NASA Astrophysics Data System (ADS)

    Koshelev, Alexander; Calafiore, Giuseppe; Piña-Hernandez, Carlos; Allen, Frances I.; Dhuey, Scott; Sassolini, Simone; Wong, Edward; Lum, Paul; Munechika, Keiko; Cabrini, Stefano

    2016-08-01

    In this Letter we present a Fresnel lens fabricated on the end of an optical fiber. The lens is fabricated using nanoimprint lithography of a functional high refractive index material, which is suitable for mass production. The main advantage of the presented Fresnel lens compared to a conventional fiber lens is its high refractive index (n=1.69), which enables efficient light focusing even inside other media such as water or adhesive. Measurement of the lens performance in an immersion liquid (n=1.51) shows a near diffraction limited focal spot of 810 nm in diameter at the 1/e2 intensity level for a wavelength of 660 nm. Applications of such fiber lenses include integrated optics, optical trapping and fiber probes.

  10. High refractive index Fresnel lens on a fiber fabricated by nanoimprint lithography for immersion applications.

    PubMed

    Koshelev, Alexander; Calafiore, Giuseppe; Piña-Hernandez, Carlos; Allen, Frances I; Dhuey, Scott; Sassolini, Simone; Wong, Edward; Lum, Paul; Munechika, Keiko; Cabrini, Stefano

    2016-08-01

    In this Letter, we present a Fresnel lens fabricated on the end of an optical fiber. The lens is fabricated using nanoimprint lithography of a functional high refractive index material, which is suitable for mass production. The main advantage of the presented Fresnel lens compared to a conventional fiber lens is its high refractive index (n=1.68), which enables efficient light focusing even inside other media, such as water or an adhesive. Measurement of the lens performance in an immersion liquid (n=1.51) shows a near diffraction limited focal spot of 810 nm in diameter at the 1/e2 intensity level for a wavelength of 660 nm. Applications of such fiber lenses include integrated optics, optical trapping, and fiber probes. PMID:27472584

  11. Novel conformal organic antireflective coatings for advanced I-line lithography

    NASA Astrophysics Data System (ADS)

    Deshpande, Shreeram V.; Nowak, Kelly A.; Fowler, Shelly; Williams, Paul; Arjona, Mikko

    2001-08-01

    Flash memory chips are playing a critical role in semiconductor devices due to increased popularity of hand held electronic communication devices such as cell phones and PDAs (personal Digital Assistants). Flash memory offers two primary advantages in semiconductor devices. First, it offers flexibility of in-circuit programming capability to reduce the loss from programming errors and to significantly reduce commercialization time to market for new devices. Second, flash memory has a double density memory capability through stacked gate structures which increases the memory capability and thus saves significantly on chip real estate. However, due to stacked gate structures the requirements for manufacturing of flash memory devices are significantly different from traditional memory devices. Stacked gate structures also offer unique challenges to lithographic patterning materials such as Bottom Anti-Reflective Coating (BARC) compositions used to achieve CD control and to minimize standing wave effect in photolithography. To be applicable in flash memory manufacturing a BARC should form a conformal coating on high topography of stacked gate features as well as provide the normal anti-reflection properties for CD control. In this paper we report on a new highly conformal advanced i-line BARC for use in design and manufacture of flash memory devices. Conformal BARCs being significantly thinner in trenches than the planarizing BARCs offer the advantage of reducing BARC overetch and thus minimizing resist thickness loss.

  12. Automated scanning probe lithography with n-alkanethiol self assembled monolayers on Au(111): Application for teaching undergraduate laboratories

    PubMed Central

    Brown, Treva T.; LeJeune, Zorabel M.; Liu, Kai; Hardin, Sean; Li, Jie-Ren; Rupnik, Kresimir; Garno, Jayne C.

    2010-01-01

    Controllers for scanning probe instruments can be programmed for automated lithography to generate desired surface arrangements of nanopatterns of organic thin films, such as n-alkanethiol self-assembled monolayers (SAMs). In this report, atomic force microscopy (AFM) methods of lithography known as nanoshaving and nanografting are used to write nanopatterns within organic thin films. Commercial instruments provide software to control the length, direction, speed, and applied force of the scanning motion of the tip. For nanoshaving, higher forces are applied to an AFM tip to selectively remove regions of the matrix monolayer, exposing bare areas of the gold substrate. Nanografting is accomplished by force-induced displacement of molecules of a matrix SAM, followed immediately by the surface self-assembly of n-alkanethiol molecules from solution. Advancements in AFM automation enable rapid protocols for nanolithography, which can be accomplished within the tight time restraints of undergraduate laboratories. Example experiments with scanning probe lithography (SPL) will be described in this report that were accomplished by undergraduate students during laboratory course activities and research internships in the chemistry department of Louisiana State University. Students were introduced to principles of surface analysis and gained “hands-on” experience with nanoscale chemistry. PMID:21483651

  13. Development of Nanosphere Lithography Technique with Enhanced Lithographical Accuracy on Periodic Si Nanostructure for Thin Si Solar Cell Application

    NASA Astrophysics Data System (ADS)

    Choi, Jeayoung

    In this thesis, a novel silica nanosphere (SNS) lithography technique has been developed to offer a fast, cost-effective, and large area applicable nano-lithography approach. The SNS can be easily deposited with a simple spin-coating process after introducing a N,N-dimethyl-formamide (DMF) solvent which can produce a highly close packed SNS monolayer over large silicon (Si) surface area, since DMF offers greatly improved wetting, capillary and convective forces in addition to slow solvent evaporation rate. Since the period and dimension of the surface pattern can be conveniently changed and controlled by introducing a desired size of SNS, and additional SNS size reduction with dry etching process, using SNS for lithography provides a highly effective nano-lithography approach for periodically arrayed nano-/micro-scale surface patterns with a desired dimension and period. Various Si nanostructures ( i.e., nanopillar, nanotip, inverted pyramid, nanohole) are successfully fabricated with the SNS nano-lithography technique by using different etching technique like anisotropic alkaline solution (i.e., KOH) etching, reactive-ion etching (RIE), and metal-assisted chemical etching (MaCE). In this research, computational optical modeling is also introduced to design the Si nanostructure, specifically nanopillars (NPs) with a desired period and dimension. The optical properties of Si NP are calculated with two different optical modeling techniques, which are the rigorous coupled wave analysis (RCWA) and finite-difference time-domain (FDTD) methods. By using these two different optical modeling techniques, the optical properties of Si NPs with different periods and dimensions have been investigated to design ideal Si NP which can be potentially used for thin c-Si solar cell applications. From the results of the computational and experimental work, it was observed that low aspect ratio Si NPs fabricated in a periodic hexagonal array can provide highly enhanced light absorption

  14. Thick SU8 microstructures prepared by broadband UV lithography and the applications in MEMS devices

    NASA Astrophysics Data System (ADS)

    Li, Dong-ling; Wen, Zhi-yu; Shang, Zheng-guo; She, Yin

    2016-05-01

    Thick SU8 microstructures with high aspect ratio and good side wall quality were fabricated by ultraviolet (UV) lithography, and the processing parameters were comprehensively studied. It proves that the adhesion of SU8 on silicon (Si) substrates is influenced by Si-OH on the surface, and can be improved by the HF treatment. Cracks and delamination are caused by large internal stress during fabrication process, and are significantly influenced by soft bake and post-exposure bake processes. The internal stress is reduced by a low post-exposure bake exposure temperature of 85 °C for 40 min. A three-step soft bake enhances the reflowing of SU8 photoresist, and results in uniform surface and less air bubbles. The vertical side wall is obtained with the optimized exposure dose of 800 mJ/cm2 for the thickness of 160 μm. Using the optimized fabrication process combined with a proper structure design, dense SU8 micro pillars are achieved with the aspect ratio of 10 and the taper angle of 89.86°. Finally, some possible applications of SU8 in micro-electromechanical system (MEMS) device are developed and demonstrated.

  15. Control of zinc oxide nanowire array properties with electron-beam lithography templating for photovoltaic applications

    NASA Astrophysics Data System (ADS)

    Nicaise, Samuel M.; Cheng, Jayce J.; Kiani, Amirreza; Gradečak, Silvija; Berggren, Karl K.

    2015-02-01

    Hydrothermally synthesized zinc oxide nanowire arrays have been used as nanostructured acceptors in emerging photovoltaic (PV) devices. The nanoscale dimensions of such arrays allow for enhanced charge extraction from PV active layers, but the device performance critically depends on the nanowire array pitch and alignment. In this study, we templated hydrothermally-grown ZnO nanowire arrays via high-resolution electron-beam-lithography defined masks, achieving the dual requirements of high-resolution patterning at a pitch of several hundred nanometers, while maintaining hole sizes small enough to control nanowire array morphology. We investigated several process conditions, including the effect of annealing sputtered and spincoated ZnO seed layers on nanowire growth, to optimize array property metrics—branching from individual template holes and off-normal alignment. We found that decreasing template hole size decreased branching prevalence but also reduced alignment. Annealing seed layers typically improved alignment, and sputtered seed layers yielded nanowire arrays superior to spincoated seed layers. We show that these effects arose from variation in the size of the template holes relative to the ZnO grain size in the seed layer. The quantitative control of branching and alignment of the nanowire array that is achieved in this study will open new paths toward engineering more efficient electrodes to increase photocurrent in nanostructured PVs. This control is also applicable to inorganic nanowire growth in general, nanomechanical generators, nanowire transistors, and surface-energy engineering.

  16. Indus-2 X-ray lithography beamline for X-ray optics and material science applications

    SciTech Connect

    Dhamgaye, V. P. Lodha, G. S.

    2014-04-24

    X-ray lithography is an ideal technique by which high aspect ratio and high spatial resolution micro/nano structures are fabricated using X-rays from synchrotron radiation source. The technique has been used for fabricating optics (X-ray, visible and infrared), sensors and actuators, fluidics and photonics. A beamline for X-ray lithography is operational on Indus-2. The beamline offers wide lithographic window from 1-40keV photon energy and wide beam for producing microstructures in polymers upto size ∼100mm × 100mm. X-ray exposures are possible in air, vacuum and He gas environment. The air based exposures enables the X-ray irradiation of resist for lithography and also irradiation of biological and liquid samples.

  17. Directed self-assembly lithography and its application based on simulation approach.

    PubMed

    Kim, Sang-Kon

    2012-04-01

    The directed self-assembly (DSA) technology of block copolymers is a candidate for next-generation lithography. The computation model of this lithography can assist in overcoming its challenges. In this paper, a template-assisted self-assembly (DSA graphoepitaxy) is modeled and simulated in a molecular scale to reduce the process complexity. For a full simulation, the template fabrication and DSA process are modeled and simulated to evaluate the impact of the process parameters on the pattern profile. Simulation results similar to the experimental results allow the prediction of the self-assembled patterns of the confined block polymers.

  18. Au nanostructure arrays for plasmonic applications: annealed island films versus nanoimprint lithography

    NASA Astrophysics Data System (ADS)

    Lopatynskyi, Andrii M.; Lytvyn, Vitalii K.; Nazarenko, Volodymyr I.; Guo, L. Jay; Lucas, Brandon D.; Chegel, Volodymyr I.

    2015-03-01

    This paper attempts to compare the main features of random and highly ordered gold nanostructure arrays (NSA) prepared by thermally annealed island film and nanoimprint lithography (NIL) techniques, respectively. Each substrate possesses different morphology in terms of plasmonic enhancement. Both methods allow such important features as spectral tuning of plasmon resonance position depending on size and shape of nanostructures; however, the time and cost is quite different. The respective comparison was performed experimentally and theoretically for a number of samples with different geometrical parameters. Spectral characteristics of fabricated NSA exhibited an expressed plasmon peak in the range from 576 to 809 nm for thermally annealed samples and from 606 to 783 nm for samples prepared by NIL. Modelling of the optical response for nanostructures with typical shapes associated with these techniques (parallelepiped for NIL and semi-ellipsoid for annealed island films) was performed using finite-difference time-domain calculations. Mathematical simulations have indicated the dependence of electric field enhancement on the shape and size of the nanoparticles. As an important point, the distribution of electric field at so-called `hot spots' was considered. Parallelepiped-shaped nanoparticles were shown to yield maximal enhancement values by an order of magnitude greater than their semi-ellipsoid-shaped counterparts; however, both nanoparticle shapes have demonstrated comparable effective electrical field enhancement values. Optimized Au nanostructures with equivalent diameters ranging from 85 to 143 nm and height equal to 35 nm were obtained for both techniques, resulting in the largest electrical field enhancement. The application of island film thermal annealing method for nanochips fabrication can be considered as a possible cost-effective platform for various surface-enhanced spectroscopies; while the NIL-fabricated NSA looks like more effective for sensing of

  19. Radiation induced surface modification and contamination for EUV lithography and fusion applications

    NASA Astrophysics Data System (ADS)

    Al-Ajlony, Al-Montaser Bellah

    Al-Montaser Bellah Al-Ajlony. Ph.D., Purdue University, May 2014. Radiation Induced Surface Modification and Contamination for EUV Lithography and Fusion Applications. Major Professor: Ahmed Hassanein. The effect of ionizing radiation on materials surfaces is of major interest for many engineering applications. The importance of this topic rises from the severity of the implications that a surface at a certain application might suffer due its interaction with some sort of ionizing radiation. The severity of implication is not always related to the severity of the radiation, in many applications the concern comes from the over-sensitivity of the surface to a low doses of radiations. One example of these sensitive applications is the extreme ultraviolet (EUV) induced surface contaminations of the optics in EUV lithography devices. In this application, a small dose of ionizing radiation (EUV at 13.5 nm wavelength) can cause slight change in the chemical composition of the irradiated surface. This change in chemical composition can cause large change in the surface optical properties of the irradiated surface (EUV optics). This degradation in reflectivity is an issue that needs to be avoided. On the other extreme where intense radiation is implemented, the main concern of the radiation-surface interaction comes from the severity of the irradiation process. The plasma-facing component (PFC) in future thermonuclear devices represent the ultimate example where the materials might be exposed to severe irradiation processes. Under such extreme irradiation processes, some candidate PFC materials exhibit the formation of very fine and fragile nanostructure (Fuzz) that can be washed out into the fusion device plasma and stop the fusion reaction. These two extreme examples of the radiation-surface interaction were selected to be my PhD research topic. The change in chemical properties of Ru surface during exposure to a 13.5 nm wavelength of EUV light radiation was investigated

  20. Next generation electron beam lithography system F7000 for wide range applications

    NASA Astrophysics Data System (ADS)

    Hayakawa, Hirofumi; Takizawa, Masahiro; Kurokawa, Masaki; Tsuda, Akiyoshi; Takigawa, Masami; Hamaguchi, Shin-ichi; Yamada, Akio; Sakamoto, Kiichi; Nakamura, Takayuki

    2013-06-01

    For multi-purpose applications such as advanced LSIs, photonics, MEMS, and other nano- fabrications, it is important for electron beam (EB) writers that handle the various substrates with their own single mechanical platform. We have been developing the adjusting pallet function both 200mm and 300mm bases to satisfy this requirement. By analyzing actual examples of adjusting pallets we proved their effectiveness to their applications. The combination of adjusting pallet function, 1Xnm resolution column and character projection technologies will enable the next generation EB writer "F7000" to fit from Fab to Lab applications.

  1. Beam pen lithography

    NASA Astrophysics Data System (ADS)

    Huo, Fengwei; Zheng, Gengfeng; Liao, Xing; Giam, Louise R.; Chai, Jinan; Chen, Xiaodong; Shim, Wooyoung; Mirkin, Chad A.

    2010-09-01

    Lithography techniques are currently being developed to fabricate nanoscale components for integrated circuits, medical diagnostics and optoelectronics. In conventional far-field optical lithography, lateral feature resolution is diffraction-limited. Approaches that overcome the diffraction limit have been developed, but these are difficult to implement or they preclude arbitrary pattern formation. Techniques based on near-field scanning optical microscopy can overcome the diffraction limit, but they suffer from inherently low throughput and restricted scan areas. Highly parallel two-dimensional, silicon-based, near-field scanning optical microscopy aperture arrays have been fabricated, but aligning a non-deformable aperture array to a large-area substrate with near-field proximity remains challenging. However, recent advances in lithographies based on scanning probe microscopy have made use of transparent two-dimensional arrays of pyramid-shaped elastomeric tips (or `pens') for large-area, high-throughput patterning of ink molecules. Here, we report a massively parallel scanning probe microscopy-based approach that can generate arbitrary patterns by passing 400-nm light through nanoscopic apertures at each tip in the array. The technique, termed beam pen lithography, can toggle between near- and far-field distances, allowing both sub-diffraction limit (100 nm) and larger features to be generated.

  2. Post-lithography pattern modification and its application to a tunable wire grid polarizer

    NASA Astrophysics Data System (ADS)

    Stach, Michal; Chang, En-Chiang; Yang, Chung-Yuan; Lo, Cheng-Yao

    2013-03-01

    This study reports a simple and cost-effective post-lithography solution for reducing the characteristic dimensions of structures on the nanometer scale using an external mechanical force without any modification of the existing exposure system. In particular, this study presents a tunable aluminum wire grid polarizer (WGP) made by a laser interference lithography and i-line (365 nm) exposure setup on polyethylene naphthalate. The WGP achieves a 58% maximum linewidth shrinkage of the metal nanowire on the polymer substrate, and further improved the polarization extinction ratio by 83% with a defined operation window and optimized strain. The simulations in this study prove the rise of the extinction ratio with the modulation of the WGP pattern. Physical evidence explains the fall of the extinction ratio for both the increase of the metal crack volume and the delaminated randomly oriented fall-on fragments under extensive operation.

  3. Post-lithography pattern modification and its application to a tunable wire grid polarizer.

    PubMed

    Stach, Michal; Chang, En-Chiang; Yang, Chung-Yuan; Lo, Cheng-Yao

    2013-03-22

    This study reports a simple and cost-effective post-lithography solution for reducing the characteristic dimensions of structures on the nanometer scale using an external mechanical force without any modification of the existing exposure system. In particular, this study presents a tunable aluminum wire grid polarizer (WGP) made by a laser interference lithography and i-line (365 nm) exposure setup on polyethylene naphthalate. The WGP achieves a 58% maximum linewidth shrinkage of the metal nanowire on the polymer substrate, and further improved the polarization extinction ratio by 83% with a defined operation window and optimized strain. The simulations in this study prove the rise of the extinction ratio with the modulation of the WGP pattern. Physical evidence explains the fall of the extinction ratio for both the increase of the metal crack volume and the delaminated randomly oriented fall-on fragments under extensive operation.

  4. Phase-controlled entanglement in a quantum-beat laser: application to quantum lithography

    NASA Astrophysics Data System (ADS)

    Sete, Eyob A.; Dorfman, Konstantin E.; Dowling, Jonathan P.

    2011-11-01

    We study entanglement generation and control in a quantum-beat laser coupled to a two-mode squeezed vacuum reservoir. We show that the generated entanglement is robust against cavity losses and environmental decoherence and can be controlled by tuning the phases of the microwave and the squeezed input fields. Moreover, we discuss two-photon correlations, absorption and implementations in quantum optical lithography.

  5. Successful demonstration of a comprehensive lithography defect monitoring strategy

    NASA Astrophysics Data System (ADS)

    Peterson, Ingrid B.; Breaux, Louis H.; Cross, Andrew; von den Hoff, Michael

    2003-07-01

    This paper describes the validation of the methodology, the model and the impact of an optimized Lithography Defect Monitoring Strategy at two different semiconductor manufacturing factories. The lithography defect inspection optimization was implemented for the Gate Module at both factories running 0.13-0.15μm technologies on 200mm wafers, one running microprocessor and the other memory devices. As minimum dimensions and process windows decrease in the lithography area, new technologies and technological advances with resists and resist systems are being implemented to meet the demands. Along with these new technological advances in the lithography area comes potentially unforeseen defect issues. The latest lithography processes involve new resists in extremely thin, uniform films, exposing the films under conditions of highly optimized focus and illumination, and finally removing the resist completely and cleanly. The lithography cell is defined as the cluster of process equipment that accomplishes the coating process (surface prep, resist spin, edge-bead removal and soft bake), the alignment and exposure, and the developing process (post-exposure bake, develop, rinse) of the resist. Often the resist spinning process involves multiple materials such as BARC (bottom ARC) and / or TARC (top ARC) materials in addition to the resist itself. The introduction of these new materials with the multiple materials interfaces and the tightness of the process windows leads to an increased variety of defect mechanisms in the lithography area. Defect management in the lithography area has become critical to successful product introduction and yield ramp. The semiconductor process itself contributes the largest number and variety of defects, and a significant portion of the total defects originate within the lithography cell. From a defect management perspective, the lithography cell has some unique characteristics. First, defects in the lithography process module have the

  6. Defect reduction for semiconductor memory applications using jet and flash imprint lithography

    NASA Astrophysics Data System (ADS)

    Ye, Zhengmao; Luo, Kang; Irving, J. W.; Lu, Xiaoming; Zhang, Wei; Fletcher, Brian; Liu, Weijun; Xu, Frank; LaBrake, Dwayne; Resnick, Douglas; Sreenivasan, S. V.

    2013-03-01

    Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash Imprint Lithography (J-FIL) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in the mask by capillary action. Following this filling step, the resist is crosslinked under UV radiation, and then the mask is removed leaving a patterned resist on the substrate. Acceptance of imprint lithography for manufacturing will require demonstration that it can attain defect levels commensurate with the defect specifications of high end memory devices. Typical defectivity targets are on the order of 0.10/cm2. In previous studies, we have focused on defects such as random non-fill defects occurring during the resist filling process and repeater defects caused by interactions with particles on the substrate. In this work, we attempted to identify the critical imprint defect types using a mask with NAND Flash-like patterns at dimensions as small as 26nm. The two key defect types identified were line break defects induced by small particulates and airborne contaminants which result in local adhesion failure. After identification, the root cause of the defect was determined, and corrective measures were taken to either eliminate or reduce the defect source. As a result, we have been able to reduce defectivity levels by more than three orders of magnitude in only 12 months and are now achieving defectivity adders as small as 2 adders per lot of wafers.

  7. Immersion lithography bevel solutions

    NASA Astrophysics Data System (ADS)

    Tedeschi, Len; Tamada, Osamu; Sanada, Masakazu; Yasuda, Shuichi; Asai, Masaya

    2008-03-01

    The introduction of Immersion lithography, combined with the desire to maximize the number of potential yielding devices per wafer, has brought wafer edge engineering to the forefront for advanced semiconductor manufactures. Bevel cleanliness, the position accuracy of the lithography films, and quality of the EBR cut has become more critical. In this paper, the effectiveness of wafer track based solutions to enable state-of-art bevel schemes is explored. This includes an integrated bevel cleaner and new bevel rinse nozzles. The bevel rinse nozzles are used in the coating process to ensure a precise, clean film edge on or near the bevel. The bevel cleaner is used immediately before the wafer is loaded into the scanner after the coating process. The bevel cleaner shows promise in driving down defectivity levels, specifically printing particles, while not damaging films on the bevel.

  8. Fabrication of Poly(ethylene glycol) Hydrogel Structures for Pharmaceutical Applications using Electron beam and Optical Lithography

    PubMed Central

    Bae, Misuk; Divan, Ralu; Suthar, Kamlesh J.; Mancini, Derrick C.; Gemeinhart, Richard A.

    2011-01-01

    Soft-polymer based microparticles are currently being applied in many biomedical applications, ranging from bioimaging and bioassays to drug delivery carriers. As one class of soft-polymers, hydrogels are materials, which can be used for delivering drug cargoes and can be fabricated in controlled sizes. Among the various hydrogel-forming polymers, poly(ethylene glycol) (PEG) based hydrogel systems are widely used due to their negligible toxicity and limited immunogenic recognition. Physical and chemical properties of particles (i.e., particle size, shape, surface charge, and hydrophobicity) are known to play an important role in cell-particle recognition and response. To understand the role of physicochemical properties of PEG-based hydrogel structures on cells, it is important to have geometrically precise and uniform hydrogel structures. To fabricate geometrically uniform structures, we have employed electron beam lithography (EBL) and ultra-violet optical lithography (UVL) using PEG or PEG diacrylate polymers. These hydrogel structures have been characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM), optical microscopy, and attenuated total reflection Fourier-transform infrared spectroscopy (ATR-FTIR) confirming control of chemistry, size, and shape. PMID:21423572

  9. Fundamental study of optical threshold layer approach towards double exposure lithography

    NASA Astrophysics Data System (ADS)

    Gu, Xinyu; Berro, Adam J.; Cho, Younjin; Jen, Kane; Lee, Saul; Ngai, Tomoki; Ogata, Toshiyuki; Durand, William J.; Sundaresan, Arunkumar; Lancaster, Jeffrey R.; Jockusch, Steffen; Zimmerman, Paul; Turro, Nicholas J.; Willson, C. G.

    2009-03-01

    193 immersion lithography has reached its maximal achievable resolution. There are mainly two lithographic strategies that will enable continued increase in resolution. Those are being pursued in parallel. The first is extreme ultraviolet (EUV) lithography and the second is double patterning (exposure) lithography. EUV lithography is counted on to be available in 2013 time frame for 22 nm node. Unfortunately, this technology has suffered several delays due to fundamental problems with source power, mask infrastructure, metrology and overall reliability. The implementation of EUV lithography in the next five years is unlikely due to economic factors. Double patterning lithography (DPL) is a technology that has been implemented by the industry and has already shown the proof of concept for the 22nm node. This technique while expensive is the only current path forward for scaling with no fundamental showstoppers for the 32nm and 22nm nodes. Double exposure lithography (DEL) is being proposed as a cost mitigating approach to advanced lithography. Compared to DPL, DEL offers advantages in overlay and process time, thus reducing the cost-of-ownership (CoO). However, DEL requires new materials that have a non-linear photoresponse. So far, several approaches were proposed for double exposure lithography, from which Optical Threshold Layer (OTL) was found to give the best lithography performance according to the results of the simulation. This paper details the principle of the OTL approach. A photochromic polymer was designed and synthesized. The feasibility of the material for application of DEL was explored by a series of evaluations.

  10. Application of nanoimprint lithography to nano-optics: wire grid polarizer and photonic crystal LED

    NASA Astrophysics Data System (ADS)

    Lee, Ki-Dong; Kim, Sang-Hoon; Park, Joo-Do; Kim, Ja-Yeon; Park, Seong-Ju

    2007-02-01

    Two optical devices with nano-scale subwavelength structures have been fabricated by using nanoimprint lithography (NIL). (1) Wire grid polarizer (WGP) is one of key optical components for projection displays with liquid crystal micro-display. Although WGP with 140 nm pitch is commercially available now, it still poses a problem with low extinction ratio (ER) for blue color. Since the ER can be increased by reducing the pitch, fabrication of a WGP with 100 nm pitch was attempted by NIL. We successfully developed thermal nanoimprint and aluminum dry etching processes. Fabricated WGPs showed twice higher ER than 140 nm pitch one. (2) Photonic crystal (PC) structures on LED have been known to enhance the light extraction significantly. Although e-beam lithography has been used for the proof of principle, it is far from real production method. We applied thermal NIL to fabricate PC structures in p-GaN layer of green LED. To identify the PC effect, two structures were fabricated and compared. One structure makes the green light of 525 nm wavelength fall within the photonic band gap (PBG) while the other puts it outside of PBG. The former structure showed 9-fold increment of photoluminescence compared to LED without PC structures, while the latter showed only 6-fold increment

  11. Charting CEBL's role in mainstream semiconductor lithography

    NASA Astrophysics Data System (ADS)

    Lam, David K.

    2013-09-01

    historically kept it out of mainstream fabs. Thanks to continuing EBDW advances combined with the industry's move to unidirectional (1D) gridded layout style, EBDW promises to cost-efficiently complement 193nm ArF immersion (193i) optical lithography in high volume manufacturing (HVM). Patterning conventional 2D design layouts with 193i is a major roadblock in device scaling: the resolution limitations of optical lithography equipment have led to higher mask cost and increased lithography complexity. To overcome the challenge, IC designers have used 1D layouts with "lines and cuts" in critical layers.1 Leading logic and memory chipmakers have been producing advanced designs with lines-and-cuts in HVM for several technology nodes in recent years. However, cut masks in multiple optical patterning are getting extremely costly. Borodovsky proposes Complementary Lithography in which another lithography technology is used to pattern line-cuts in critical layers to complement optical lithography.2 Complementary E-Beam Lithography (CEBL) is a candidate to pattern the Cuts of optically printed Lines. The concept of CEBL is gaining acceptance. However, challenges in throughput, scaling, and data preparation rate are threatening to deny CEBL's role in solving industry's lithography problem. This paper will examine the following issues: The challenges of massively parallel pixel writing The solutions of multiple mini-column design/architecture in: Boosting CEBL throughput Resolving issues of CD control, CDU, LER, data rate, higher resolution, and 450mm wafers The role of CEBL in next-generation solution of semiconductor lithography

  12. High throughput Jet and Flash Imprint Lithography for semiconductor memory applications

    NASA Astrophysics Data System (ADS)

    Zhang, Wei; Fletcher, Brian; Thompson, Ecron; Liu, Weijun; Stachowiak, Tim; Khusnatdinov, Niyaz; Irving, J. W.; Longsine, Whitney; Traub, Matthew; Truskett, Van; LaBrake, Dwayne; Ye, Zhengmao

    2016-03-01

    Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash* Imprint Lithography (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in the mask by capillary action. Following this filling step, the resist is crosslinked under UV radiation, and then the mask is removed, leaving a patterned resist on the substrate. There are two critical components to meeting throughput requirements for imprint lithography. Using a similar approach to what is already done for many deposition and etch processes, imprint stations can be clustered to enhance throughput. The FPA-1200NZ2C is a four station cluster system designed for high volume manufacturing. For a single station, throughput includes overhead, resist dispense, resist fill time (or spread time), exposure and separation. Resist exposure time and mask/wafer separation are well understood processing steps with typical durations on the order of 0.10 to 0.20 seconds. To achieve a total process throughput of 15 wafers per hour (wph) for a single station, it is necessary to complete the fluid fill step in 1.5 seconds. For a throughput of 20 wph, fill time must be reduced to only one second. There are several parameters that can impact resist filling. Key parameters include resist drop volume (smaller is better), system controls (which address drop spreading after jetting), Design for Imprint or DFI (to accelerate drop spreading) and material engineering (to promote wetting between the resist and underlying adhesion layer). In addition, it is mandatory to maintain fast filling, even for edge field imprinting. In this paper, we address the improvements made in all of these parameters to enable a 1.50 second filling process for a sub-20nm device like pattern and have demonstrated this capability

  13. Metal-Mesh Lithography

    PubMed Central

    Tang, Zhao; Wei, Qingshan; Wei, Alexander

    2011-01-01

    Metal-mesh lithography (MML) is a practical hybrid of microcontact printing and capillary force lithography that can be applied over millimeter-sized areas with a high level of uniformity. MML can be achieved by blotting various inks onto substrates through thin copper grids, relying on preferential wetting and capillary interactions between template and substrate for pattern replication. The resulting mesh patterns, which are inverted relative to those produced by stenciling or serigraphy, can be reproduced with low micrometer resolution. MML can be combined with other surface chemistry and lift-off methods to create functional microarrays for diverse applications, such as periodic islands of gold nanorods and patterned corrals for fibroblast cell cultures. PMID:22103322

  14. Metal-mesh lithography.

    PubMed

    Tang, Zhao; Wei, Qingshan; Wei, Alexander

    2011-12-01

    Metal-mesh lithography (MML) is a practical hybrid of microcontact printing and capillary force lithography that can be applied over millimeter-sized areas with a high level of uniformity. MML can be achieved by blotting various inks onto substrates through thin copper grids, relying on preferential wetting and capillary interactions between template and substrate for pattern replication. The resulting mesh patterns, which are inverted relative to those produced by stenciling or serigraphy, can be reproduced with low micrometer resolution. MML can be combined with other surface chemistry and lift-off methods to create functional microarrays for diverse applications, such as periodic islands of gold nanorods and patterned corrals for fibroblast cell cultures.

  15. Advances in lidar applications

    NASA Astrophysics Data System (ADS)

    Lewandowski, Piotr Andrzej

    Quantitative laser remote sensing (lidar) measurements have always posed a challenge for the research community. The complexity of the data inversion and the instrumentation itself makes lidar results difficult to interpret. This dissertation presents a suite of 3 elastic lidar experiments. The goal of these studies was to quantitatively approach atmospheric physical phenomena such as rainfall (chapter 3), a distribution of concentration of particulates in Mexico City (chapter 4) and emission rates and emission factors from an agricultural facility in Iowa (chapter 5). The studies demonstrate that elastic lidar measurements are possible not only in a qualitative sense but also in a quantitative sense. The lidar study of rainfall was intended to provide rainfall data in small spatial and temporal scales (1.5m and 1s resolution). The two levels of lidar inversion algorithms allowed the calculation of rainfall rates in small scales. The problem of the distribution of particles over Mexico City required mobile lidar measurements. The elastic lidar data were successfully inverted to extinction coefficients which were then combined with aerosol size distribution. As a result, a spatial distribution of particulate concentration was created to illustrate the transport processes and intensity of Mexico City pollution. The measurements of particulate emission fluxes from a livestock facility involved a stationary scanning elastic lidar, in-situ aerosol size distribution measurements and wind measurements. The data from the 3 independent measurement platforms combined together resulted in emission rates and emission factors. The results from this experiment demonstrated that the new lidar approach is an adequate tool for measurement of aerosol emissions from livestock production facilities. The studies presented in the dissertation show quantitative lidar measurements in combination with other instruments measurements. This approach significantly extends the applications of

  16. VUV lithography

    DOEpatents

    George, E.V.; Oster, Y.; Mundinger, D.C.

    1990-12-25

    Deep UV projection lithography can be performed using an e-beam pumped solid excimer UV source, a mask, and a UV reduction camera. The UV source produces deep UV radiation in the range 1,700--1,300A using xenon, krypton or argon; shorter wavelengths of 850--650A can be obtained using neon or helium. A thin solid layer of the gas is formed on a cryogenically cooled plate and bombarded with an e-beam to cause fluorescence. The UV reduction camera utilizes multilayer mirrors having high reflectivity at the UV wavelength and images the mask onto a resist coated substrate at a preselected demagnification. The mask can be formed integrally with the source as an emitting mask. 6 figs.

  17. VUV lithography

    DOEpatents

    George, Edward V.; Oster, Yale; Mundinger, David C.

    1990-01-01

    Deep UV projection lithography can be performed using an e-beam pumped solid excimer UV source, a mask, and a UV reduction camera. The UV source produces deep UV radiation in the range 1700-1300A using xenon, krypton or argon; shorter wavelengths of 850-650A can be obtained using neon or helium. A thin solid layer of the gas is formed on a cryogenically cooled plate and bombarded with an e-beam to cause fluorescence. The UV reduction camera utilizes multilayer mirrors having high reflectivity at the UV wavelength and images the mask onto a resist coated substrate at a preselected demagnification. The mask can be formed integrally with the source as an emitting mask.

  18. Maskless lithography

    DOEpatents

    Sweatt, W.C.; Stulen, R.H.

    1999-02-09

    The present invention provides a method for maskless lithography. A plurality of individually addressable and rotatable micromirrors together comprise a two-dimensional array of micromirrors. Each micromirror in the two-dimensional array can be envisioned as an individually addressable element in the picture that comprises the circuit pattern desired. As each micromirror is addressed it rotates so as to reflect light from a light source onto a portion of the photoresist coated wafer thereby forming a pixel within the circuit pattern. By electronically addressing a two-dimensional array of these micromirrors in the proper sequence a circuit pattern that is comprised of these individual pixels can be constructed on a microchip. The reflecting surface of the micromirror is configured in such a way as to overcome coherence and diffraction effects in order to produce circuit elements having straight sides. 12 figs.

  19. Maskless lithography

    DOEpatents

    Sweatt, William C.; Stulen, Richard H.

    1999-01-01

    The present invention provides a method for maskless lithography. A plurality of individually addressable and rotatable micromirrors together comprise a two-dimensional array of micromirrors. Each micromirror in the two-dimensional array can be envisioned as an individually addressable element in the picture that comprises the circuit pattern desired. As each micromirror is addressed it rotates so as to reflect light from a light source onto a portion of the photoresist coated wafer thereby forming a pixel within the circuit pattern. By electronically addressing a two-dimensional array of these micromirrors in the proper sequence a circuit pattern that is comprised of these individual pixels can be constructed on a microchip. The reflecting surface of the micromirror is configured in such a way as to overcome coherence and diffraction effects in order to produce circuit elements having straight sides.

  20. Distortion free projection lithography

    SciTech Connect

    Hawryluk, A.M.; Ceglio, N.M.; Phillion, D.W.; Gaines, D.P.

    1991-07-09

    Soft x-ray projection lithography (SXPL) may be used to fabricate high resolution structures for future devices, but will require an all-reflecting optical system with {approximately} 100 nm resolution and < 10 nm image distortion over large fields-of-view. In present designs, the lithographic tool for SXPL is envisioned as a ring-field'' scanning system with multiple (3--5), possibly aspheric, imaging optics fabricated to {approximately} < 1 nm figure precision. In its present form, several technologies must be developed before this tool can become practical. A simple, non-scanning optical system with less expensive optics, reduced mirror reflection losses and lower source power requirements would be very attractive. We have developed a technique, called Encoded Mask Lithography (EML), which allows for distortion free, high resolution reticle replication over a large field-of-view while using an imaging system with substantial inherent distortion. When applied to SXPL, EML allows us to use a simple, two spherical mirror imaging system. The simplified optical system used in EML eases optic fabrication requirements, obviates the need for mask-to-wafer scanning, and decreases multilayer mirror reflection losses and source power requirements. Although developed for SXPL, this concept is applicable to all forms of projection lithography where distortion over large fields may be a problem. 10 refs., 4 figs.

  1. The application of variable universe fuzzy PID controller in computer-aided alignment of lithography projector

    NASA Astrophysics Data System (ADS)

    Zhang, Mei; Zheng, Meng; Li, Yanqiu

    2013-12-01

    A variable universe fuzzy PID algorithm is designed to control the misalignment of the lithography projection optics to meet the requirement of high image quality. This paper first simulates the alignment of Schwarzschild objective designed by us. Secondly, the variable universe fuzzy PID control is introduced to feed back the misalignment of Schwarzschild objective to the control system to drive the stage which holds the objective. So the position can be adjusted automatically. This feedback scheme can adjust the variables' universe self-adaptively by using fuzzy rules so that the concrete function and parameters of the contraction-expansion factor are not necessary. Finally, the proposed approach is demonstrated by simulations. The results show that, variable universe fuzzy PID method exhibits better performance in both improving response speed and decreasing overshoot compared to conventional PID and fuzzy PID control methods. In addition, the interference signal can be effectively restrained. It is concluded that this method can improve the dynamic and static properties of system and meet the requirement of fast response.

  2. Defect reduction for semiconductor memory applications using jet and flash imprint lithography

    NASA Astrophysics Data System (ADS)

    Ye, Zhengmao; Luo, Kang; Lu, Xiaoming; Fletcher, Brian; Liu, Weijun; Xu, Frank; LaBrake, Dwayne; Resnick, Douglas J.; Sreenivasan, S. V.

    2012-07-01

    Acceptance of imprint lithography for manufacturing will require demonstration that it can attain defect levels commensurate with the defect specifications of high-end memory devices. Defects occurring during imprinting can generally be broken into two categories; random defects and repeating defects. Examples of random defects include fluid phase imprint defects, such as bubbles, and solid phase imprint defects, such as line collapse. Examples of repeater defects include mask fabrication defects and particle induced defects. Previous studies indicated that soft particles cause nonrepeating defects. Hard particles, on the other hand, can cause either permanent resist plugging or mask damage. In a previous study, two specific defect types were examined; random nonfill defects occurring during the resist filling process and repeater defects caused by interactions with particles on the substrate. We attempted to identify the different types of imprint defect types using a mask with line/space patterns at dimensions as small as 26 nm. An Imprio 500 twenty-wafer per hour development tool was used to study the various defect types. The imprint defect density was reduced nearly four orders of magnitude, down to ˜4/cm2 in a period of two years following the availability of low defect imprint masks at 26-nm half-pitch. This reduction was achieved by identifying the root cause of various defects and then taking the appropriate corrective action.

  3. Study of barrier coats for application in immersion 193-nm lithography

    NASA Astrophysics Data System (ADS)

    Houlihan, Francis; Kim, Wookyu; Sakamuri, Raj; Hamilton, Keino; Dimerli, Alla; Abdallah, David; Romano, Andrew; Dammel, Ralph R.; Pawlowski, Georg; Raub, Alex; Brueck, Steve

    2005-05-01

    We will describe our barrier coat approach for use in immersion 193 nm lithography. These barrier coats may act as either simple barriers providing protection against loss of resist components into water or in the case of one type of these formulations which have a refractive index at 193 nm which is the geometric mean between that of the resist and water provide, also top antireflective properties. Either type of barrier coat can be applied with a simple spinning process compatible with PGMEA based resin employing standard solvents such as alcohols and be removed during the usual resist development process with aqueous 0.26 N TMAH. We will discuss both imaging results with these materials on acrylate type 193 nm resists and also show some fundamental studies we have done to understand the function of the barrier coat and the role of differing spinning solvents and resins. We will show LS (55 nm) and Contact Hole (80 nm) resolved with a 193 nm resist exposed with the interferometric tool at the University of New Mexico (213 nm) with and without the use of a barrier coat.

  4. Quasi-3D gold nanoring cavity arrays with high-density hot-spots for SERS applications via nanosphere lithography

    NASA Astrophysics Data System (ADS)

    Ho, Chi-Chih; Zhao, Ke; Lee, Tze-Yang

    2014-07-01

    Large-scale ordered arrays with dense hot spots are highly desirable substrates for practical applications such as surface-enhanced Raman scattering (SERS). In the past decade, most work has focused on using lateral gaps between two metal structures. However, the strength and density of the generated hot spots are limited to a 2D arrangement of nanostructures. In this work, we present a novel quasi-3D nanoring cavity structure, which contains a nanoring and a nanopillar in a nanohole. The fabrication is based on nanosphere lithography incorporated with dry etching and gold coating. Gold nanostructures with one layer (nanohole), 2 layers (nanohole + nanodisc), and 3 layers (nanohole + nanoring + nanopillar) were successfully fabricated and compared. The SERS performance of the three-layered nanostructures is about two orders of magnitude higher than the others. Finite-difference time-domain (FDTD) simulations show that incorporating nanopillars and nanorings into a nanohole array not only significantly increases the density of the hot spots but also achieves stronger electromagnetic field enhancements compared to a nanohole array. The simple fabrication of multilayered quasi-3D nanostructures provides a large-area and highly efficient SERS substrates for biological and chemical applications.Large-scale ordered arrays with dense hot spots are highly desirable substrates for practical applications such as surface-enhanced Raman scattering (SERS). In the past decade, most work has focused on using lateral gaps between two metal structures. However, the strength and density of the generated hot spots are limited to a 2D arrangement of nanostructures. In this work, we present a novel quasi-3D nanoring cavity structure, which contains a nanoring and a nanopillar in a nanohole. The fabrication is based on nanosphere lithography incorporated with dry etching and gold coating. Gold nanostructures with one layer (nanohole), 2 layers (nanohole + nanodisc), and 3 layers

  5. Evaluation of an advanced process control solution to detect wafer positioning issues within the hot and cold plate modules of a lithography track

    NASA Astrophysics Data System (ADS)

    Guillaume, Olivier; Bouchardy, Marc; Armellin, Louis-Pierre

    2006-03-01

    To run the various steps of the process, multiple robot arm transfers within the Hot and Cold Plate modules which directly influence the critical dimension of the production wafers were performed on the lithography track. Wafer positioning inside these modules was found to be one of the key parameters to obtain the best critical dimensional uniformity across the wafer. With the currently realized track monitoring and conventional Statistical Process Control (SPC), potential process drifts or errors within these modules can only be detected from wafers measured during the post process control of product parameters. To catch all potential non-conformal production wafers directly at the tool, minimize equipment downtime and identify the root cause of maintenance issues, the real-time control of tool and process parameters is required. This paper presents the results of the evaluation of an Advanced Process Control (APC) solution used to detect in real-time mode any wafer positioning issues within the Hot and Cold Plate modules of a lithography track based on the monitoring of the plate temperature profile during wafer processing. After an explanation of the methodology used to collect the data from the tool, an initial phase of analysis of the temperature profile of the different Hot Plate modules was carried out. The monitoring of the temperature range was identified as the key parameter for the detection of wafer positioning issues where the temperature profile depends on the number of resistive heating elements, temperature settings and process conditions of the Hot Plate. The wafer tilt was simulated to compare the temperature profile to standard process conditions and in turn determine the detection capability. For the Cold Plate module, it was necessary to know the time between the end of the hot step and the start of the following cold step in order to detect a real tilt issue.

  6. Electron Beam Lithography

    NASA Astrophysics Data System (ADS)

    Harriott, Lloyd R.

    1997-04-01

    Electron beams have played a significant role in semiconductor technology for more than twenty years. Early electron beam machines used a raster scanned beam spot to write patterns in electron-sensitive polymer resist materials. The main application of electron beam lithography has been in mask making. Despite the inherently high spatial resolution and wide process margins of electron beam lithography, the writing rate for semiconductor wafers has been too slow to be economically viable on a large scale. In the late 1970's, variable shape electron beam writing was developed, projecting a rectangular beam whose size can be varied for each "shot" exposure of a particular pattern, allowing some integrated circuits to be made economically where a variety of "customized" patterns are desired. In the cell or block projection electron beam exposure technique, a unit cell of a repetitive pattern is projected repeatedly to increase the level of parallelism. This can work well for highly repetitive patterns such as memory chips but is not well suited to complex varying patterns such as microprocessors. The rapid progress in the performance of integrated circuits has been largely driven by progress in optical lithography, through improvements in lens design and fabrication as well as the use of shorter wavelengths for the exposure radiation. Due to limitations from the opacity of lens and mask materials, it is unlikely that conventional optical printing methods can be used at wavelengths below 193 nm or feature sizes much below 180 nm. One candidate technology for a post-optical era is the Scattering with Angular Limitation Projection Electron-beam Lithography (SCALPEL) approach, which combines the high resolution and wide process latitude inherent in electron beam lithography with the throughput of a parallel projection system. A mask consisting of a low atomic number membrane and a high atomic number pattern layer is uniformly illuminated with high energy (100 ke

  7. Benzophenone doped polydimethylsiloxane: self developable composite resist system for its use in a direct write laser lithography application

    NASA Astrophysics Data System (ADS)

    Bute, Madhushree G.; Shinde, Shashikant D.; Bodas, Dhananjay; Fouad, H.; Adhi, K. P.; Gosavi, S. W.

    2015-05-01

    This paper reports a benzophenone doped polydimethylsiloxane (PDMS) composite resist system, for micro patterning using direct write laser lithography for its use in lab-on-chip (LOC) applications. A 248 nm excimer laser with a 20 ns pulse width is used for microfabrication of doped-PDMS. The effect of two major aspects viz. resist composition and laser processing parameters on the quality of fabricated microstructures is studied and optimized. The lithographic analysis reveals that the doped-PDMS shows self developable sensitivity at lower threshold fluence, 250 mJ cm-2. The optimized composition ratio 10: 1: 0.3 (wt%) of the PDMS monomer: curing agent: Benzophenone (P:C:B) is used for processing and analysis. Comprehensive analysis on the effect of laser ablation parameters (fluence, frequency and number of laser pulses) on etching performance (etch rate, geometry of micropattern and quality of surface) is presented. Increase in etch rate with fluence (250-650 mJ cm-2) is observed and considered to be in a working range. Simultaneously, increase in surface roughness as a function of fluence >650 mJ cm-2 is observed which can be associated with rapid rise in the photothermal decomposition of the composite resist. However pulse repetition rate (PRR) at 1, 5 and 10 Hz does not offer any significant effect on etch rate. The surface quality at a higher PRR is deprived due to redeposition of ablated material which concludes 1 Hz as a suitable working frequency. The deterioration of surface quality with increasing PRR is associated with the formation of a heat affected zone, due to cumulative heating, as the increase in temperature Δ T≤ft(TsN+1-{{T}s}\\right) is 362 °C at 5 Hz and 624 °C at 10 Hz, above Ts ~ 1099 °C for 1 Hz. However, the number of pulses and etch rate are inversely related due to the plume effect. The overall study provides a guideline for precise control on fast prototyping direct write laser lithography processes

  8. E-beam to complement optical lithography for 1D layouts

    NASA Astrophysics Data System (ADS)

    Lam, David K.; Liu, Enden D.; Smayling, Michael C.; Prescop, Ted

    2011-04-01

    The semiconductor industry is moving to highly regular designs, or 1D gridded layouts, to enable scaling to advanced nodes, as well as improve process latitude, chip size and chip energy consumption. The fabrication of highly regular ICs is straightforward. Poly and metal layers are arranged into 1D layouts. These 1D layouts facilitate a two-step patterning approach: a line-creation step, followed by a line-cutting step, to form the desired IC pattern (See Figure 1). The first step, line creation, can be accomplished with a variety of lithography techniques including 193nm immersion (193i) and Self-Aligned Double Patterning (SADP). It appears feasible to create unidirectional parallel lines to at least 11 nm half-pitch, with two applications of SADP for pitch division by four. Potentially, this step can also be accomplished with interference lithography or directed self assembly in the future. The second step, line cutting, requires an extremely high-resolution lithography technique. At advanced nodes, the only options appear to be the costly quadruple patterning with 193i, or EUV or E-Beam Lithography (EBL). This paper focuses on the requirements for a lithography system for "line cutting", using EBL to complement Optical. EBL is the most cost-effective option for line cutting at advanced nodes for HVM.

  9. Application of rigorously optimized phase masks for the fabrication of binary and blazed gratings with diffractive proximity lithography

    NASA Astrophysics Data System (ADS)

    Stuerzebecher, Lorenz; Fuchs, Frank; Harzendorf, Torsten; Meyer, Stefan; Zeitner, Uwe D.

    2014-03-01

    Gratings with binary and blazed profiles and periods in the low micron and sub-micron range define a class of microstructures with a huge application potential. We present a mask based photolithographic fabrication method for these demanding grating geometries. It combines the advantages of electron beam lithography and holographic exposure, which are superior homogeneity, high resolution and pattern flexibility on one hand, and a fast, large aerial exposure with the option for smooth profiles on the other hand. This is accomplished by the use of an electron beam written phase mask which contains a very homogeneous pattern of diffractive features and is used for a full-field exposure in a proximity mask aligner. The key for the beneficial use of the technology is the proper design of the phase mask surface profile which can have a binary or multilevel geometry. Since the patterns to be exposed are periodic, this is also the case for the phase mask which allows calculating their physical light transmission with exact methods like rigorous coupled wave analysis. An optimization algorithm has been developed which can find mask geometries that synthesize a desired complex aerial image in the proximity distance of choice. Aerial images offering e.g. high resolution features, phase shifts, and tilted propagation directions can be realized that way. This technology has been successfully used to fabricate e.g. binary gratings of very high quality with a period of 800 nm as well as blazed gratings with a period of 3 μm.

  10. Application of natural linear polysaccharide to green resist polymers for electron beam and extreme-ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Takei, Satoshi; Oshima, Akihiro; Oyama, Tomoko G.; Ito, Kenta; Sugahara, Kigen; Kashiwakura, Miki; Kozawa, Takahiro; Tagawa, Seiichi; Hanabata, Makoto

    2014-11-01

    The application of natural linear polysaccharide to green resist polymers was demonstrated for electron beam (EB) and extreme-ultraviolet (EUV) lithography using organic-solvent-free water spin-coating and tetramethylammonium hydroxide (TMAH)-free water-developable techniques. The water spin-coating and water-developable processes in a green resist material were carried out on wafers because of the water solubility of natural polysaccharides for an environmentally friendly manufacturing process for next-generation electronic devices. The developed green resist material with a weight-average molecular weight of 83,000 and 70 mol % hydroxyl groups as a water-developable feature was found to have acceptable properties such as spin-coat ability on 200 mm wafers, prediction sensitivity to EUV at the wavelengths of 6.7 and 13.5 nm, a high contrast of the water dissolution rate before and after EB irradiation, pillar patterns of 100-400 nm with a high EB sensitivity of 10 µC/cm2, and etch selectivity with a silicon-based middle layer in CF4 plasma treatment.

  11. Porphyrin-Based Photocatalytic Lithography

    SciTech Connect

    Bearinger, J; Stone, G; Christian, A; Dugan, L; Hiddessen, A; Wu, K J; Wu, L; Hamilton, J; Stockton, C; Hubbell, J

    2007-10-15

    Photocatalytic lithography is an emerging technique that couples light with coated mask materials in order to pattern surface chemistry. We excite porphyrins to create radical species that photocatalytically oxidize, and thereby pattern, chemistries in the local vicinity. The technique advantageously does not necessitate mass transport or specified substrates, it is fast and robust and the wavelength of light does not limit the resolution of patterned features. We have patterned proteins and cells in order to demonstrate the utility of photocatalytic lithography in life science applications.

  12. Enzyme Mimics: Advances and Applications.

    PubMed

    Kuah, Evelyn; Toh, Seraphina; Yee, Jessica; Ma, Qian; Gao, Zhiqiang

    2016-06-13

    Enzyme mimics or artificial enzymes are a class of catalysts that have been actively pursued for decades and have heralded much interest as potentially viable alternatives to natural enzymes. Aside from having catalytic activities similar to their natural counterparts, enzyme mimics have the desired advantages of tunable structures and catalytic efficiencies, excellent tolerance to experimental conditions, lower cost, and purely synthetic routes to their preparation. Although still in the midst of development, impressive advances have already been made. Enzyme mimics have shown immense potential in the catalysis of a wide range of chemical and biological reactions, the development of chemical and biological sensing and anti-biofouling systems, and the production of pharmaceuticals and clean fuels. This Review concerns the development of various types of enzyme mimics, namely polymeric and dendrimeric, supramolecular, nanoparticulate and proteinic enzyme mimics, with an emphasis on their synthesis, catalytic properties and technical applications. It provides an introduction to enzyme mimics and a comprehensive summary of the advances and current standings of their applications, and seeks to inspire researchers to perfect the design and synthesis of enzyme mimics and to tailor their functionality for a much wider range of applications. PMID:27062126

  13. Bubble-Pen Lithography.

    PubMed

    Lin, Linhan; Peng, Xiaolei; Mao, Zhangming; Li, Wei; Yogeesh, Maruthi N; Rajeeva, Bharath Bangalore; Perillo, Evan P; Dunn, Andrew K; Akinwande, Deji; Zheng, Yuebing

    2016-01-13

    Current lithography techniques, which employ photon, electron, or ion beams to induce chemical or physical reactions for micro/nano-fabrication, have remained challenging in patterning chemically synthesized colloidal particles, which are emerging as building blocks for functional devices. Herein, we develop a new technique - bubble-pen lithography (BPL) - to pattern colloidal particles on substrates using optically controlled microbubbles. Briefly, a single laser beam generates a microbubble at the interface of colloidal suspension and a plasmonic substrate via plasmon-enhanced photothermal effects. The microbubble captures and immobilizes the colloidal particles on the substrate through coordinated actions of Marangoni convection, surface tension, gas pressure, and substrate adhesion. Through directing the laser beam to move the microbubble, we create arbitrary single-particle patterns and particle assemblies with different resolutions and architectures. Furthermore, we have applied BPL to pattern CdSe/ZnS quantum dots on plasmonic substrates and polystyrene (PS) microparticles on two-dimensional (2D) atomic-layer materials. With the low-power operation, arbitrary patterning and applicability to general colloidal particles, BPL will find a wide range of applications in microelectronics, nanophotonics, and nanomedicine.

  14. Nanobiocatalyst advancements and bioprocessing applications

    PubMed Central

    Misson, Mailin; Zhang, Hu; Jin, Bo

    2015-01-01

    The nanobiocatalyst (NBC) is an emerging innovation that synergistically integrates advanced nanotechnology with biotechnology and promises exciting advantages for improving enzyme activity, stability, capability and engineering performances in bioprocessing applications. NBCs are fabricated by immobilizing enzymes with functional nanomaterials as enzyme carriers or containers. In this paper, we review the recent developments of novel nanocarriers/nanocontainers with advanced hierarchical porous structures for retaining enzymes, such as nanofibres (NFs), mesoporous nanocarriers and nanocages. Strategies for immobilizing enzymes onto nanocarriers made from polymers, silicas, carbons and metals by physical adsorption, covalent binding, cross-linking or specific ligand spacers are discussed. The resulting NBCs are critically evaluated in terms of their bioprocessing performances. Excellent performances are demonstrated through enhanced NBC catalytic activity and stability due to conformational changes upon immobilization and localized nanoenvironments, and NBC reutilization by assembling magnetic nanoparticles into NBCs to defray the high operational costs associated with enzyme production and nanocarrier synthesis. We also highlight several challenges associated with the NBC-driven bioprocess applications, including the maturation of large-scale nanocarrier synthesis, design and development of bioreactors to accommodate NBCs, and long-term operations of NBCs. We suggest these challenges are to be addressed through joint collaboration of chemists, engineers and material scientists. Finally, we have demonstrated the great potential of NBCs in manufacturing bioprocesses in the near future through successful laboratory trials of NBCs in carbohydrate hydrolysis, biofuel production and biotransformation. PMID:25392397

  15. Maskless, reticle-free, lithography

    DOEpatents

    Ceglio, Natale M.; Markle, David A.

    1997-11-25

    A lithography system in which the mask or reticle, which usually carries the pattern to be printed onto a substrate, is replaced by a programmable array of binary (i.e. on/off) light valves or switches which can be programmed to replicate a portion of the pattern each time an illuminating light source is flashed. The pattern of light produced by the programmable array is imaged onto a lithographic substrate which is mounted on a scanning stage as is common in optical lithography. The stage motion and the pattern of light displayed by the programmable array are precisely synchronized with the flashing illumination system so that each flash accurately positions the image of the pattern on the substrate. This is achieved by advancing the pattern held in the programmable array by an amount which corresponds to the travel of the substrate stage each time the light source flashes. In this manner the image is built up of multiple flashes and an isolated defect in the array will only have a small effect on the printed pattern. The method includes projection lithographies using radiation other than optical or ultraviolet light. The programmable array of binary switches would be used to control extreme ultraviolet (EUV), x-ray, or electron, illumination systems, obviating the need for stable, defect free masks for projection EUV, x-ray, or electron, lithographies.

  16. Maskless, reticle-free, lithography

    DOEpatents

    Ceglio, N.M.; Markle, D.A.

    1997-11-25

    A lithography system in which the mask or reticle, which usually carries the pattern to be printed onto a substrate, is replaced by a programmable array of binary (i.e. on/off) light valves or switches which can be programmed to replicate a portion of the pattern each time an illuminating light source is flashed. The pattern of light produced by the programmable array is imaged onto a lithographic substrate which is mounted on a scanning stage as is common in optical lithography. The stage motion and the pattern of light displayed by the programmable array are precisely synchronized with the flashing illumination system so that each flash accurately positions the image of the pattern on the substrate. This is achieved by advancing the pattern held in the programmable array by an amount which corresponds to the travel of the substrate stage each time the light source flashes. In this manner the image is built up of multiple flashes and an isolated defect in the array will only have a small effect on the printed pattern. The method includes projection lithographies using radiation other than optical or ultraviolet light. The programmable array of binary switches would be used to control extreme ultraviolet (EUV), x-ray, or electron, illumination systems, obviating the need for stable, defect free masks for projection EUV, x-ray, or electron, lithographies. 7 figs.

  17. Advances and Applications for Geodesy

    NASA Astrophysics Data System (ADS)

    Calais, Eric; Schwartz, Susan; Arrowsmith, Ramon

    2010-07-01

    2010 UNAVCO Science Workshop; Boulder, Colorado, 8-11 March 2010; Geodesy's reach has expanded rapidly in recent years as EarthScope and international data sets have grown and new disciplinary applications have emerged. To explore advances in geodesy and its applications in geoscience research and education, approximately 170 scientists (representing 11 countries: Colombia, Denmark, Ecuador, France, Japan, Lebanon, Mexico, New Zealand, Russia, Spain, and the United States), including 15 students, gathered at the 2010 UNAVCO Science Workshop in Colorado. UNAVCO is a nonprofit membership-governed consortium that facilitates geoscience research and education using geodesy. Plenary sessions integrated discovery with broad impact and viewed geodesy through three lenses: (1) pixel-by-pixel geodetic imaging where various remote sensing methodologies are revealing fine-scale changes in the near-surface environment and the geologic processes responsible for them; (2) epoch-by-epoch deformation time series measured in seconds to millennia, which are uncovering ephemeral processes associated with the earthquake cycle and glacial and groundwater flow; and (3) emerging observational powers from advancing geodetic technologies. A fourth plenary session dealt with geodesy and water, a new strategic focus on the hydrosphere, cryosphere, and changing climate. Keynotes included a historical perspective by Bernard Minster (Scripps Institution of Oceanography) on space geodesy and its applications to geophysics, and a summary talk by Susan Eriksson (UNAVCO) on the successes of Research Experience in Solid Earth Science for Students (RESESS) and its 5-year follow-on with opportunities to mentor the next generation of geoscientists through cultivation of diversity.

  18. Polymer and Material Design for Lithography From 50 nm Node to the sub-16 nm Node

    NASA Astrophysics Data System (ADS)

    Trefonas, Peter

    2012-02-01

    Microlithography is one of the technologies which enabled the Information Age. Developing at the intersection of optical physics, polymer science and photochemistry, the need for ever smaller high fidelity patterns to build integrated circuits is currently pushing the technology evolution from 193 nm immersion lithography to extreme ultraviolet lithography (13.5 nm) to alternate patterning technologies such as directed self assembly (DSA) of block copolymers. Essential to the success of this progression is a rapid application of new concepts and materials in polymer science. We will discuss the requirements for 193 immersion lithography and how advanced acrylic random polymers are being designed with chemical amplification functionality to meet these needs. The special requirements of a water immersion lithography led to the invention and rapid commercial application of surface assembled embedded barrier layer polymers. Design of polymers for EUV lithography is having to respond to much different challenges, prominent being the dearth of photons in the exposure step, and the other being how to maximize the efficiency of photoacid production. In parallel, alternative lithographic approaches are being developed using directed self assembly of block copolymers which realize pattern frequency multiplication. We will update with our progress in the applications of polymers designed for DSA.

  19. Advanced textile applications for primary aircraft structures

    NASA Technical Reports Server (NTRS)

    Jackson, Anthony C.; Barrie, Ronald E.; Shah, Bharat M.; Shukla, Jay G.

    1992-01-01

    Advanced composite primary structural concepts were evaluated for low cost, damage tolerant structures. Development of advanced textile preforms for fuselage structural applications with resin transfer molding and powder epoxy materials are now under development.

  20. Advanced textile applications for primary aircraft structures

    NASA Technical Reports Server (NTRS)

    Jackson, Anthony C.; Barrie, Ronald E.; Shah, Bharat M.; Shukla, Jay G.

    1992-01-01

    Advanced composite primary structural concepts have been evaluated for low cost, damage tolerant structures. Development of advanced textile preforms for fuselage structural applications with resin transfer molding and powder epoxy material is now under development.

  1. Plan for advanced microelectronics processing technology application

    SciTech Connect

    Goland, A.N.

    1990-10-01

    The ultimate objective of the tasks described in the research agreement was to identify resources primarily, but not exclusively, within New York State that are available for the development of a Center for Advanced Microelectronics Processing (CAMP). Identification of those resources would enable Brookhaven National Laboratory to prepare a program plan for the CAMP. In order to achieve the stated goal, the principal investigators undertook to meet the key personnel in relevant NYS industrial and academic organizations to discuss the potential for economic development that could accompany such a Center and to gauge the extent of participation that could be expected from each interested party. Integrated of these discussions was to be achieved through a workshop convened in the summer of 1990. The culmination of this workshop was to be a report (the final report) outlining a plan for implementing a Center in the state. As events unfolded, it became possible to identify the elements of a major center for x-ray lithography on Lone Island at Brookhaven National Laboratory. The principal investigators were than advised to substitute a working document based upon that concept in place of a report based upon the more general CAMP workshop originally envisioned. Following that suggestion from the New York State Science and Technology Foundation, the principals established a working group consisting of representatives of the Grumman Corporation, Columbia University, the State University of New York at Stony Brook, and Brookhaven National Laboratory. Regular meetings and additional communications between these collaborators have produced a preproposal that constitutes the main body of the final report required by the contract. Other components of this final report include the interim report and a brief description of the activities which followed the establishment of the X-ray Lithography Center working group.

  2. Nanostructured surfaces using thermal nanoimprint lithography: Applications in thin membrane technology, piezoelectric energy harvesting and tactile pressure sensing

    NASA Astrophysics Data System (ADS)

    Nabar, Bhargav Pradip

    Nanoimprint lithography (NIL) is emerging as a viable contender for fabrication of large-scale arrays of 5-500 nm features. The work presented in this dissertation aims to leverage the advantages of NIL for realization of novel Nano Electro Mechanical Systems (NEMS). The first application is a nanoporous membrane blood oxygenator system. A fabrication process for realization of thin nanoporous membranes using thermal nanoimprint lithography is presented. Suspended silicon nitride membranes were fabricated by Low-Pressure Chemical Vapor Deposition (LPCVD) in conjunction with a potassium hydroxide-based bulk micromachining process. Nanoscale features were imprinted into a commercially available thermoplastic polymer resist using a pre-fabricated silicon mold. The pattern was reversed and transferred to a thin aluminum oxide layer by means of a novel two stage lift-off technique. The patterned aluminum oxide was used as an etch mask in a CHF3/He based reactive ion etch process to transfer the pattern to silicon nitride. Highly directional etch profiles with near vertical sidewalls and excellent Si3N4/Al2O3 etch selectivity was observed. One-micrometer-thick porous membranes with varying dimensions of 250x250 microm2 to 450x450 microm 2 and pore diameter of 400 nm have been engineered and evaluated. Results indicate that the membranes have consistent nanopore dimensions and precisely defined porosity, which makes them ideal as gas exchange interfaces in blood oxygenation systems as well as other applications such as dialysis. Additionally, bulk -- micromachined microfluidic channels have been developed for uniform, laminar blood flow with minimal cell trauma. NIL has been used for ordered growth of crystalline nanostructures for sensing and energy harvesting. Highly ordered arrays of crystalline ZnO nanorods have been fabricated using a polymer template patterned by thermal nanoimprint lithography, in conjunction with a low temperature hydrothermal growth process. Zinc

  3. High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field

    PubMed Central

    Wen, X.; Datta, A.; Traverso, L. M.; Pan, L.; Xu, X.; Moon, E. E.

    2015-01-01

    Optical lithography, the enabling process for defining features, has been widely used in semiconductor industry and many other nanotechnology applications. Advances of nanotechnology require developments of high-throughput optical lithography capabilities to overcome the optical diffraction limit and meet the ever-decreasing device dimensions. We report our recent experimental advancements to scale up diffraction unlimited optical lithography in a massive scale using the near field nanolithography capabilities of bowtie apertures. A record number of near-field optical elements, an array of 1,024 bowtie antenna apertures, are simultaneously employed to generate a large number of patterns by carefully controlling their working distances over the entire array using an optical gap metrology system. Our experimental results reiterated the ability of using massively-parallel near-field devices to achieve high-throughput optical nanolithography, which can be promising for many important nanotechnology applications such as computation, data storage, communication, and energy. PMID:26525906

  4. High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field

    NASA Astrophysics Data System (ADS)

    Wen, X.; Datta, A.; Traverso, L. M.; Pan, L.; Xu, X.; Moon, E. E.

    2015-11-01

    Optical lithography, the enabling process for defining features, has been widely used in semiconductor industry and many other nanotechnology applications. Advances of nanotechnology require developments of high-throughput optical lithography capabilities to overcome the optical diffraction limit and meet the ever-decreasing device dimensions. We report our recent experimental advancements to scale up diffraction unlimited optical lithography in a massive scale using the near field nanolithography capabilities of bowtie apertures. A record number of near-field optical elements, an array of 1,024 bowtie antenna apertures, are simultaneously employed to generate a large number of patterns by carefully controlling their working distances over the entire array using an optical gap metrology system. Our experimental results reiterated the ability of using massively-parallel near-field devices to achieve high-throughput optical nanolithography, which can be promising for many important nanotechnology applications such as computation, data storage, communication, and energy.

  5. High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field.

    PubMed

    Wen, X; Datta, A; Traverso, L M; Pan, L; Xu, X; Moon, E E

    2015-11-03

    Optical lithography, the enabling process for defining features, has been widely used in semiconductor industry and many other nanotechnology applications. Advances of nanotechnology require developments of high-throughput optical lithography capabilities to overcome the optical diffraction limit and meet the ever-decreasing device dimensions. We report our recent experimental advancements to scale up diffraction unlimited optical lithography in a massive scale using the near field nanolithography capabilities of bowtie apertures. A record number of near-field optical elements, an array of 1,024 bowtie antenna apertures, are simultaneously employed to generate a large number of patterns by carefully controlling their working distances over the entire array using an optical gap metrology system. Our experimental results reiterated the ability of using massively-parallel near-field devices to achieve high-throughput optical nanolithography, which can be promising for many important nanotechnology applications such as computation, data storage, communication, and energy.

  6. Multiplex lithography for multilevel multiscale architectures and its application to polymer electrolyte membrane fuel cell

    PubMed Central

    Cho, Hyesung; Moon Kim, Sang; Sik Kang, Yun; Kim, Junsoo; Jang, Segeun; Kim, Minhyoung; Park, Hyunchul; Won Bang, Jung; Seo, Soonmin; Suh, Kahp-Yang; Sung, Yung-Eun; Choi, Mansoo

    2015-01-01

    The production of multiscale architectures is of significant interest in materials science, and the integration of those structures could provide a breakthrough for various applications. Here we report a simple yet versatile strategy that allows for the LEGO-like integrations of microscale membranes by quantitatively controlling the oxygen inhibition effects of ultraviolet-curable materials, leading to multilevel multiscale architectures. The spatial control of oxygen concentration induces different curing contrasts in a resin allowing the selective imprinting and bonding at different sides of a membrane, which enables LEGO-like integration together with the multiscale pattern formation. Utilizing the method, the multilevel multiscale Nafion membranes are prepared and applied to polymer electrolyte membrane fuel cell. Our multiscale membrane fuel cell demonstrates significant enhancement of performance while ensuring mechanical robustness. The performance enhancement is caused by the combined effect of the decrease of membrane resistance and the increase of the electrochemical active surface area. PMID:26412619

  7. Partially Coherent Quantitative Phase Retrieval with Applications to Extreme Ultraviolet Lithography

    NASA Astrophysics Data System (ADS)

    Claus, Rene Andre

    This dissertation presents a new quantitative phase retrieval algorithm that fully models partially coherent imaging in microscopes. Unlike existing algorithms, our algorithm fully considers the pupil function and illumination by using the Weak Object Transfer Function (WOTF). Using an iterative approach, we extend the applicability of the WOTF beyond weakly scattering objects. This allows almost any measurement to be used during phase retrieval. As an example of how this feature can be used to invent practical new measurement schemes, we present the illumination switched pupil. This measurement uses a phase contrast objective and varied illumination to maximize the sensitivity of the microscope to both the phase and amplitude of the sample. Using only two images, the complex field can be recovered with high sensitivity at almost all spatial frequencies. A complete model of imaging in the microscope enables self-calibration of the measurements and improved phase retrieval. Since all important characteristics of the microscope can be incorporated, an optimization over critical parameters, such as the best focus position and image alignment, can be performed after the images have been captured. This allows errors in the calibration to be corrected after the measurements have been performed, improving the accuracy of the recovered field while simplifying the experiments. To verify and apply the algorithm experimentally, we have performed phase retrieval measurements of Extreme Ultraviolet (EUV) photomasks on the zone plate microscope, SHARP, at Lawrence Berkeley National Laboratory (LBNL). Phase retrieval has enabled the quantitative analysis of multilayer roughness and defects. Experiments, comparing the size of defects measured using phase retrieval to measurements performed by AFM, indicate that AFM consistently underestimates the effective height of the buried multilayer defects by 1 nm. Other measurements of defects, comparing the recovered field extracted from

  8. Advanced Materials for Space Applications

    NASA Technical Reports Server (NTRS)

    Pater, Ruth H.; Curto, Paul A.

    2005-01-01

    Since NASA was created in 1958, over 6400 patents have been issued to the agency--nearly one in a thousand of all patents ever issued in the United States. A large number of these inventions have focused on new materials that have made space travel and exploration of the moon, Mars, and the outer planets possible. In the last few years, the materials developed by NASA Langley Research Center embody breakthroughs in performance and properties that will enable great achievements in space. The examples discussed below offer significant advantages for use in small satellites, i.e., those with payloads under a metric ton. These include patented products such as LaRC SI, LaRC RP 46, LaRC RP 50, PETI-5, TEEK, PETI-330, LaRC CP, TOR-LM and LaRC LCR (patent pending). These and other new advances in nanotechnology engineering, self-assembling nanostructures and multifunctional aerospace materials are presented and discussed below, and applications with significant technological and commercial advantages are proposed.

  9. Advanced materials for space applications

    NASA Astrophysics Data System (ADS)

    Pater, Ruth H.; Curto, Paul A.

    2007-12-01

    Since NASA was created in 1958, over 6400 patents have been issued to the agency—nearly one in a thousand of all patents ever issued in the United States. A large number of these inventions have focused on new materials that have made space travel and exploration of the moon, Mars, and the outer planets possible. In the last few years, the materials developed by NASA Langley Research Center embody breakthroughs in performance and properties that will enable great achievements in space. The examples discussed below offer significant advantages for use in small satellites, i.e., those with payloads under a metric ton. These include patented products such as LaRC SI, LaRC RP 46, LaRC RP 50, PETI-5, TEEK, PETI-330, LaRC CP, TOR-LM and LaRC LCR (patent pending). These and other new advances in nanotechnology engineering, self-assembling nanostructures and multifunctional aerospace materials are presented and discussed below, and applications with significant technological and commercial advantages are proposed.

  10. 450mm wafer patterning with jet and flash imprint lithography

    NASA Astrophysics Data System (ADS)

    Thompson, Ecron; Hellebrekers, Paul; Hofemann, Paul; LaBrake, Dwayne L.; Resnick, Douglas J.; Sreenivasan, S. V.

    2013-09-01

    The next step in the evolution of wafer size is 450mm. Any transition in sizing is an enormous task that must account for fabrication space, environmental health and safety concerns, wafer standards, metrology capability, individual process module development and device integration. For 450mm, an aggressive goal of 2018 has been set, with pilot line operation as early as 2016. To address these goals, consortiums have been formed to establish the infrastructure necessary to the transition, with a focus on the development of both process and metrology tools. Central to any process module development, which includes deposition, etch and chemical mechanical polishing is the lithography tool. In order to address the need for early learning and advance process module development, Molecular Imprints Inc. has provided the industry with the first advanced lithography platform, the Imprio® 450, capable of patterning a full 450mm wafer. The Imprio 450 was accepted by Intel at the end of 2012 and is now being used to support the 450mm wafer process development demands as part of a multi-year wafer services contract to facilitate the semiconductor industry's transition to lower cost 450mm wafer production. The Imprio 450 uses a Jet and Flash Imprint Lithography (J-FILTM) process that employs drop dispensing of UV curable resists to assist high resolution patterning for subsequent dry etch pattern transfer. The technology is actively being used to develop solutions for markets including NAND Flash memory, patterned media for hard disk drives and displays. This paper reviews the recent performance of the J-FIL technology (including overlay, throughput and defectivity), mask development improvements provided by Dai Nippon Printing, and the application of the technology to a 450mm lithography platform.

  11. Wafer scale fabrication of submicron chessboard gratings using phase masks in proximity lithography

    NASA Astrophysics Data System (ADS)

    Stuerzebecher, Lorenz; Harzendorf, Torsten; Fuchs, Frank; Zeitner, Uwe D.

    2012-03-01

    One and two dimensional grating structures with submicron period have a huge number of applications in optics and photonics. Such structures are conventionally fabricated using interference or e-beam lithography. However, both technologies have significant drawbacks. Interference lithography is limited to rather simple geometries and the sequential writing scheme of e-beam lithography leads to time consuming exposures for each grating. We present a novel fabrication technique for this class of microstructures which is based on proximity lithography in a mask aligner. The technology is capable to pattern a complete wafer within less than one minute of exposure time and offers thereby high lateral resolution and a reliable process. Our advancements compared to standard mask aligner lithography are twofold: First of all, we are using periodic binary phase masks instead of chromium masks to generate an aerial image of high resolution and exceptional light efficiency at certain distances behind the mask. Second, a special mask aligner illumination set-up is employed which allows to precisely control the incidence angles of the exposure light. This degree of freedom allows both, to shape the aerial image (e. g. transformation of a periodic spot pattern into a chessboard pattern) and to increase its depth of focus considerably. That way, our technology enables the fabrication of high quality gratings with arbitrary geometry in a fast and stable wafer scale process.

  12. Feasibility study of optical/e-beam complementary lithography

    NASA Astrophysics Data System (ADS)

    Hohle, Christoph; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Jaschinsky, Philipp; Kahlenberg, Frank; Klein, Christof; Klikovits, Jan; Paul, Jan; Rudolph, Matthias; Thrun, Xaver

    2012-03-01

    Using electron beam direct write (EBDW) as a complementary approach together with standard optical lithography at 193nm or EUV wavelength has been proposed only lately and might be a reasonable solution for low volume CMOS manufacturing and special applications as well as design rule restrictions. Here, the high throughput of the optical litho can be combined with the high resolution and the high flexibility of the e-beam by using a mix & match approach (Litho- Etch-Litho-Etch, LELE). Complementary Lithography is mainly driven by special design requirements for unidirectional (1-D gridded) Manhattan type design layouts that enable scaling of advanced logic chips. This requires significant data prep efforts such as layout splitting. In this paper we will show recent results of Complementary Lithography using 193nm immersion generated 50nm lines/space pattern addressing the 32nm logic technology node that were cut with electron beam direct write. Regular lines and space arrays were patterned at GLOBALFOUNDRIES Dresden and have been cut in predefined areas using a VISTEC SB3050DW e-beam direct writer (50KV Variable Shaped Beam) at Fraunhofer Center Nanoelectronic Technologies (CNT), Dresden, as well as on the PML2 tool at IMS Nanofabrication, Vienna. Two types of e-beam resists were used for the cut exposure. Integration issues as well as overlay requirements and performance improvements necessary for this mix & match approach will be discussed.

  13. Aerospace applications of advanced aluminum alloys

    NASA Technical Reports Server (NTRS)

    Chellman, D. J.; Langenbeck, S. L.

    1993-01-01

    Advanced metallic materials within the Al-base family are being developed for applications on current and future aerospace vehicles. These advanced materials offer significant improvements in density, strength, stiffness, fracture resistance, and/or higher use temperature which translates into improved vehicle performance. Aerospace applications of advanced metallic materials include space structures, fighters, military and commercial transport aircraft, and missiles. Structural design requirements, including not only static and durability/damage tolerance criteria but also environmental considerations, drive material selections. Often trade-offs must be made regarding strength, fracture resistance, cost, reliability, and maintainability in order to select the optimum material for a specific application. These trade studies not only include various metallic materials but also many times include advanced composite materials. Details of material comparisons, aerospace applications, and material trades will be presented.

  14. Soft Lithography Using Nectar Droplets.

    PubMed

    Biswas, Saheli; Chakrabarti, Aditi; Chateauminois, Antoine; Wandersman, Elie; Prevost, Alexis M; Chaudhury, Manoj K

    2015-12-01

    In spite of significant advances in replication technologies, methods to produce well-defined three-dimensional structures are still at its infancy. Such a limitation would be evident if we were to produce a large array of simple and, especially, compound convex lenses, also guaranteeing that their surfaces would be molecularly smooth. Here, we report a novel method to produce such structures by cloning the 3D shape of nectar drops, found widely in nature, using conventional soft lithography.The elementary process involves transfer of a thin patch of the sugar solution coated on a glass slide onto a hydrophobic substrate on which this patch evolves into a microdroplet. Upon the absorption of water vapor, such a microdroplet grows linearly with time, and its final size can be controlled by varying its exposure time to water vapor. At any stage of the evolution of the size of the drop, its shape can be cloned onto a soft elastomer by following the well-known methods of molding and cross-linking the same. A unique new science that emerges in our attempt to understand the transfer of the sugar patch and its evolution to a spherical drop is the elucidation of the mechanics underlying the contact of a deformable sphere against a solid support intervening a thin liquid film. A unique aspect of this work is to demonstrate that higher level structures can also be generated by transferring even smaller nucleation sites on the surface of the primary lenses and then allowing them to grow by absorption of water vapor. What results at the end is either a well-controlled distribution of smooth hemispherical lenses or compound structures that could have potential applications in the fundamental studies of contact mechanics, wettability, and even in optics. PMID:26563988

  15. Development of new phenylcalix[4]resorcinarene: its application to positive-tone molecular resist for EB and EUV lithography

    NASA Astrophysics Data System (ADS)

    Echigo, Masatoshi; Oguro, Dai

    2009-03-01

    We have developed new positive-tone molecular resist material, C-4-(2-methyl-2-adamantyloxycarbonylmethoxy) phenylcalix[4]resorcinarene (MGR110P). MGR110P showed high solubility in both conventional resist solvents such as propylene glycol monomethyl ether and cyclohexanone. MGR110P was single molecular without molecular weight disperse. A positive-tone molecular resist based on MGR110P was evaluated by EB lithography (EBL) and EUV lithography (EUVL). This resist could be developed a standard alkaline developer of 0.26N TMAHaq. EB patterning results showed the resolution of this resist on a HMDS primed Si wafer to be 40 nm line and space at an EB exposure dose of 28μC/cm2. The line edge roughness (LER) showed 3.8 nm at 50 nm line and space pattern at EB exposure dose of 26μC/cm2. Unfortunately, 30 nm line and space pattern collapsed. In addition, EUV patterning results showed the resolution on an organic layer substrate to be 45 nm line and space at an EUV exposure dose of 10.3 mJ/cm2. Unfortunately, 40 nm to 30 nm line and space pattern collapsed.

  16. Echelle grating for silicon photonics applications: integration of electron beam lithography in the process flow and first results

    NASA Astrophysics Data System (ADS)

    Kaschel, Mathias; Letzkus, Florian; Butschke, Jörg; Skwierawski, Piotr; Schneider, Marc; Weber, Marc

    2016-05-01

    We present the technology steps to integrate an Echelle grating in the process flow of silicon-organic hybrid (SOH) modulators or related active devices. The CMOS-compatible process flow on SOI substrates uses a mix of optical i-line lithography and electron beam lithography (EBL). High speed optical data communication depends on wavelength divisions multiplexing and de-multiplexing devices like Echelle gratings. The minimum feature sizes vary from device to device and reach down to 60 nm inside a modulator, while the total area of a single Echelle grating is up to several mm2 of unprocessed silicon. Resist patterning using a variable shape beam electron beam pattern generator allows high resolution. An oxide hard mask is deposited, patterns are structured threefold by EBL and are later transferred to the silicon. We demonstrate a 9-channel multiplexer featuring a 2 dB on-chip loss and an adjacent channel crosstalk better than -22 dB. Additionally a 45-channel Echelle multiplexer is presented with 5 dB on chip loss and a channel crosstalk better than -12 dB. The devices cover an on-chip area of only 0.08 mm2 and 0.5 mm2 with a wavelength spacing of 10.5 nm and 2.0 nm, respectively.

  17. Development of MOEMS technology in maskless lithography

    NASA Astrophysics Data System (ADS)

    Smith, David; Klenk, Dieter

    2009-02-01

    Micro-opto-electro-mechanical-systems (MOEMS) have proven to be a facilitating technology in the lithography industry. Recently, there have been significant advancements in digital micromirror device (DMD) based maskless lithography. These advancements have been in the areas of throughput, resolution, accuracy, and cost reduction. This progression in digital micromirror evolution provides considerable opportunities to displace existing lithographic techniques. Precise control of the individual mircormirrors, including scrolling, and full utilization of the FPGA, have allowed DMD-based lithography systems to reach new levels of throughput and repeatability, while reducing production and warranty costs. Throughput levels have far surpassed scanning laser techniques. Chip level cooling technologies allow for higher incident power to be reliably distributed over larger areas of the substrate. Resolution roadmaps are in place to migrate from the current 2400dpi (11μm) to 4800dpi (5.3μm). Without the constraints of mask requirements, mask alignment, storage, and defect analysis are not required, thus increasing accuracy and reducing cost. This contribution will examine the advancements in and benefits of DMD based maskless lithography.

  18. Application of a Theory for Generation of Soft X-Ray by Storage Rings and Its Use For X-Ray Lithography

    SciTech Connect

    Minkov, D.; Yamada, H.; Toyosugi, N.; Morita, M.; Yamaguchi, T.

    2007-01-19

    A theory has been developed for generation of soft X-ray transition radiation (TR) by storage ring synchrotrons. It takes into consideration that the dielectric constant of the TR target material is a complex number, utilizes an explicit expression for the number of passes of an injected electron through the target, and describes more precisely the absorption of TR in the target. Such TR can be used for performing X-ray lithography (XRL), and therefore a formula is included for the sensitivity of the photoresist used in XRL. TR targets for XRL can be optimized, based on finding a maximum of the resist sensitivity. Application of this theory to optimization of Mg target shows that a target containing only one Mg foil, with a thickness of about 245 nm is the best Mg target, for performing XRL by our storage ring synchrotron MIRRORCLE-20SX.

  19. Deep X-Ray Lithography Based Fabrication of Rare-Earth Based Permanent Magnets and their Applications to Microactuators

    SciTech Connect

    Christenson, T.R.; Garino, T.J.; Venturini, E.L.

    1999-01-27

    Precision high aspect-ratio micro molds constructed by deep x-ray lithography have been used to batch fabricate accurately shaped bonded rare-earth based permanent magnets with features as small as 5 microns and thicknesses up to 500 microns. Maximum energy products of up to 8 MGOe have been achieved with a 20%/vol. epoxy bonded melt-spun isotropic Nd2Fe14b powder composite. Using individually processed sub- millimeter permanent sections multipole rotors have been assembled. Despite the fact that these permanent magnet structures are small, their magnetic field producing capability remains the same as at any scale. Combining permanent magnet structures with soft magnetic materials and micro-coils makes possible new and more efficient magnetic microdevices.

  20. Maskless, resistless ion beam lithography

    SciTech Connect

    Ji, Qing

    2003-03-10

    As the dimensions of semiconductor devices are scaled down, in order to achieve higher levels of integration, optical lithography will no longer be sufficient for the needs of the semiconductor industry. Alternative next-generation lithography (NGL) approaches, such as extreme ultra-violet (EUV), X-ray, electron-beam, and ion projection lithography face some challenging issues with complicated mask technology and low throughput. Among the four major alternative NGL approaches, ion beam lithography is the only one that can provide both maskless and resistless patterning. As such, it can potentially make nano-fabrication much simpler. This thesis investigates a focused ion beam system for maskless, resistless patterning that can be made practical for high-volume production. In order to achieve maskless, resistless patterning, the ion source must be able to produce a variety of ion species. The compact FIB system being developed uses a multicusp plasma ion source, which can generate ion beams of various elements, such as O{sub 2}{sup +}, BF{sub 2}{sup +}, P{sup +} etc., for surface modification and doping applications. With optimized source condition, around 85% of BF{sub 2}{sup +}, over 90% of O{sub 2}{sup +} and P{sup +} have been achieved. The brightness of the multicusp-plasma ion source is a key issue for its application to maskless ion beam lithography. It can be substantially improved by optimizing the source configuration and extractor geometry. Measured brightness of 2 keV He{sup +} beam is as high as 440 A/cm{sup 2} {center_dot} Sr, which represents a 30x improvement over prior work. Direct patterning of Si thin film using a focused O{sub 2}{sup +} ion beam has been investigated. A thin surface oxide film can be selectively formed using 3 keV O{sub 2}{sup +} ions with the dose of 10{sup 15} cm{sup -2}. The oxide can then serve as a hard mask for patterning of the Si film. The process flow and the experimental results for directly patterned poly-Si features

  1. Towards advanced OCT clinical applications

    NASA Astrophysics Data System (ADS)

    Kirillin, Mikhail; Panteleeva, Olga; Agrba, Pavel; Pasukhin, Mikhail; Sergeeva, Ekaterina; Plankina, Elena; Dudenkova, Varvara; Gubarkova, Ekaterina; Kiseleva, Elena; Gladkova, Natalia; Shakhova, Natalia; Vitkin, Alex

    2015-07-01

    In this paper we report on our recent achievement in application of conventional and cross-polarization OCT (CP OCT) modalities for in vivo clinical diagnostics in different medical areas including gynecology, dermatology, and stomatology. In gynecology, CP OCT was employed for diagnosing fallopian tubes and cervix; in dermatology OCT for monitoring of treatment of psoriasis, scleroderma and atopic dermatitis; and in stomatology for diagnosis of oral diseases. For all considered application, we propose and develop different image processing methods which enhance the diagnostic value of the technique. In particular, we use histogram analysis, Fourier analysis and neural networks, thus calculating different tissue characteristics as revealed by OCT's polarization evolution. These approaches enable improved OCT image quantification and increase its resultant diagnostic accuracy.

  2. Cloning pigs: advances and applications.

    PubMed

    Polejaeva, I A

    2001-01-01

    Although mouse embryonic stem cells have been used widely for over a decade as an important tool for introducing precise genetic modification into the genome, demonstrating the great value of this technology in a range of biomedical applications, similar technology does not exist for domestic animals. However, the development of somatic cell nuclear transfer has bypassed the need for embryonic stem cells from livestock. The production of offspring from differentiated cell nuclei provides information and opportunities in a number of areas including cellular differentiation, early development and ageing. However, the primary significance of cloning is probably in the opportunities that this technology brings to genetic manipulation. Potential applications of gene targeting in livestock species are described with particular emphasis on the generation of pigs that can be used for xenotransplantation, and the production of improved models for human physiology and disease. The development of techniques for somatic cell nuclear transfer in pigs and the challenges associated with this technology are also reviewed.

  3. Nanoscale Advances in Catalysis and Energy Applications

    SciTech Connect

    Li, Yimin; Somorjai, Gabor A.

    2010-05-12

    In this perspective, we present an overview of nanoscience applications in catalysis, energy conversion, and energy conservation technologies. We discuss how novel physical and chemical properties of nanomaterials can be applied and engineered to meet the advanced material requirements in the new generation of chemical and energy conversion devices. We highlight some of the latest advances in these nanotechnologies and provide an outlook at the major challenges for further developments.

  4. Signature molecular descriptor : advanced applications.

    SciTech Connect

    Visco, Donald Patrick, Jr.

    2010-04-01

    In this work we report on the development of the Signature Molecular Descriptor (or Signature) for use in the solution of inverse design problems as well as in highthroughput screening applications. The ultimate goal of using Signature is to identify novel and non-intuitive chemical structures with optimal predicted properties for a given application. We demonstrate this in three studies: green solvent design, glucocorticoid receptor ligand design and the design of inhibitors for Factor XIa. In many areas of engineering, compounds are designed and/or modified in incremental ways which rely upon heuristics or institutional knowledge. Often multiple experiments are performed and the optimal compound is identified in this brute-force fashion. Perhaps a traditional chemical scaffold is identified and movement of a substituent group around a ring constitutes the whole of the design process. Also notably, a chemical being evaluated in one area might demonstrate properties very attractive in another area and serendipity was the mechanism for solution. In contrast to such approaches, computer-aided molecular design (CAMD) looks to encompass both experimental and heuristic-based knowledge into a strategy that will design a molecule on a computer to meet a given target. Depending on the algorithm employed, the molecule which is designed might be quite novel (re: no CAS registration number) and/or non-intuitive relative to what is known about the problem at hand. While CAMD is a fairly recent strategy (dating to the early 1980s), it contains a variety of bottlenecks and limitations which have prevented the technique from garnering more attention in the academic, governmental and industrial institutions. A main reason for this is how the molecules are described in the computer. This step can control how models are developed for the properties of interest on a given problem as well as how to go from an output of the algorithm to an actual chemical structure. This report

  5. Survey of Advanced Applications Over ACTS

    NASA Technical Reports Server (NTRS)

    Bauer, Robert; McMasters, Paul

    2000-01-01

    The Advanced Communications Technology Satellite (ACTS) system provided a national testbed that enabled advanced applications to be tested and demonstrated over a live satellite link. Of the applications that used ACTS. some offered unique advantages over current methods, while others simply could not be accommodated by conventional systems. The initial technical and experiments results of the program were reported at the 1995 ACTS Results Conference. in Cleveland, Ohio. Since then, the Experiments Program has involved 45 new experiments comprising 30 application experiments and 15 technology related experiments that took advantage of the advanced technologies and unique capabilities offered by ACTS. The experiments are categorized and quantified to show the organizational mix of the experiments program and relative usage of the satellite. Since paper length guidelines preclude each experiment from being individually reported, the application experiments and significant demonstrations are surveyed to show the breadth of the activities that have been supported. Experiments in a similar application category are collectively discussed, such as. telemedicine. or networking and protocol evaluation. Where available. experiment conclusions and impact are presented and references of results and experiment information are provided. The quantity and diversity of the experiments program demonstrated a variety of service areas for the next generation of commercially available, advanced satellite communications.

  6. Ion beam lithography system

    DOEpatents

    Leung, Ka-Ngo

    2005-08-02

    A maskless plasma-formed ion beam lithography tool provides for patterning of sub-50 nm features on large area flat or curved substrate surfaces. The system is very compact and does not require an accelerator column and electrostatic beam scanning components. The patterns are formed by switching beamlets on or off from a two electrode blanking system with the substrate being scanned mechanically in one dimension. This arrangement can provide a maskless nano-beam lithography tool for economic and high throughput processing.

  7. Triple AIM evaluation and application in advanced node

    NASA Astrophysics Data System (ADS)

    Wang, Gary C.; Lio, En Chuan; Hung, Yuting; Chen, Charlie; Wang, Sybil; Weng, Tang Chun; Lin, Bill; Yu, Chun Chi

    2016-03-01

    A novel method on advanced node for IBO (Image Based Overlay) data extraction accuracy is demonstrated in this work, and here some special design in triple-AIM (Advanced Imaging Metrology) is able to realize the approach. Since triple AIM design has 3 locations left for patterning layers insertion, a new design with 2 layers locations, location-A (inner) and location-B (middle), are generated by 1st pattering, i.e. once lithography exposure, and the 2 marks grouping are formed on dielectric through lithography and etching process with a predetermined overlay "zero offset" through original mask layout design, as illustrated in Fig. (1). And then, as following top photo resist layer, assumed location-C (outer), lithography patterning process, PR coating, exposure and development complete, full triple-AIM patterns is generated, and 3 sets of overlay data could be obtained, A to B, C to B, C to A. Through re-calculating the overlay raw data of current (2nd patterning layer) to previous (1st patterning layer) layer by averaging [C to B] and [C to A], then theoretically the data extraction of sites would be more accuracy, since the variation of local marks signal, induced by inline process instability, could be minimized through the raw data averaging procedure. Moreover, from raw data [A to B], an extra monitor function for detections of the inline process variation, marks selection and recipe setting optimization could be obtained, since marks in [A] and [BB] locations are both generated in 1st patterning, and with the target "zero". So if the raw data [A to BB] is bigger or smaller than "zero" in some degree, there should be some process issue or marks condition setting error in triple-AIM design.

  8. Advanced Ceramic Materials for Future Aerospace Applications

    NASA Technical Reports Server (NTRS)

    Misra, Ajay

    2015-01-01

    With growing trend toward higher temperature capabilities, lightweight, and multifunctionality, significant advances in ceramic matrix composites (CMCs) will be required for future aerospace applications. The presentation will provide an overview of material requirements for future aerospace missions, and the role of ceramics and CMCs in meeting those requirements. Aerospace applications will include gas turbine engines, aircraft structure, hypersonic and access to space vehicles, space power and propulsion, and space communication.

  9. Fabrication of gold-deposited plasmonic crystal based on nanoimprint lithography for label-free biosensing application

    NASA Astrophysics Data System (ADS)

    Nishiguchi, Kiichi; Sueyoshi, Kenji; Hisamoto, Hideaki; Endo, Tatsuro

    2016-08-01

    Here, we developed a highly sensitive label-free plasmonic crystal (PC). The PC is composed of two types of nanoperiodic metal structures, nanodiscs and nanohole arrays, fabricated simultaneously by nanoimprint lithography using a nanostructured polymer mold. The PC absorbed light at specific wavelengths based on localized surface plasmon resonance (LSPR). The strongly enhanced electric field was excited by the combined structures of nanodiscs and nanohole arrays; thus, highly sensitive biosensing was possible. The LSPR-based optical characteristics of the PC were analyzed by finite-difference time-domain simulation; the structure (metal layer thickness) was optimized to respond to changes in the surrounding refractive index with high sensitivity. PC-based biosensor chips were prepared by immobilizing anti-human immunoglobulin G, which was successfully detected in the 200 pg/mL to 200 ng/mL range. Our approach introduces an easy and rapid process allowing large-area fabrication of PCs, resulting in a highly sensitive label-free biosensor device.

  10. Optimization of extreme ultraviolet photons emission and collection in mass-limited laser produced plasmas for lithography application

    SciTech Connect

    Sizyuk, T.; Hassanein, A.

    2012-08-01

    The progress in development of commercial system for next generation EUV lithography requires, among other factors, significant improvement in EUV photon sources such as discharge produced plasma (DPP) and laser produced plasma (LPP) devices. There are still many uncertainties in determining the optimum device since there are many parameters for the suitable and efficient energy source and target configuration and size. Complex devices with trigger lasers in DPP or with pre-pulsing in LPP provide wide area for optimization in regards to conversion efficiency (CE) and components lifetime. We considered in our analysis a promising LPP source configuration using 10-30 {mu}m tin droplet targets, and predicted conditions for the most efficient EUV radiation output and collection as well as calculating photons source location and size. We optimized several parameters of dual-beam lasers and their relationship to target size. We used our HEIGHTS comprehensive and integrated full 3D simulation package to study and optimize LPP processes with various target sizes to maximize the CE of the system.

  11. Advanced Laboratory NMR Spectrometer with Applications.

    ERIC Educational Resources Information Center

    Biscegli, Clovis; And Others

    1982-01-01

    A description is given of an inexpensive nuclear magnetic resonance (NMR) spectrometer suitable for use in advanced laboratory courses. Applications to the nondestructive analysis of the oil content in corn seeds and in monitoring the crystallization of polymers are presented. (SK)

  12. Thirty years of lithography simulation

    NASA Astrophysics Data System (ADS)

    Mack, Chris A.

    2005-05-01

    Thirty years ago Rick Dill and his team at IBM published the first account of lithography simulation - the accurate description of semiconductor optical lithography by mathematical equations. Since then, lithography simulation has grown dramatically in importance in four important areas: as a research tool, as a development tool, as a manufacturing tool, and as a learning tool. In this paper, the history of lithography simulations is traced from its roots to today"s indispensable tools for lithographic technology development. Along the way, an attempt will be made to define the true value of lithography simulation to the semiconductor industry.

  13. Advanced energy storage for space applications: A follow-up

    NASA Technical Reports Server (NTRS)

    Halpert, Gerald; Surampudi, Subbarao

    1994-01-01

    Viewgraphs on advanced energy storage for space applications are presented. Topics covered include: categories of space missions using batteries; battery challenges; properties of SOA and advanced primary batteries; lithium primary cell applications; advanced rechargeable battery applications; present limitations of advanced battery technologies; and status of Li-TiS2, Ni-MH, and Na-NiCl2 cell technologies.

  14. An ice lithography instrument

    NASA Astrophysics Data System (ADS)

    Han, Anpan; Chervinsky, John; Branton, Daniel; Golovchenko, J. A.

    2011-06-01

    We describe the design of an instrument that can fully implement a new nanopatterning method called ice lithography, where ice is used as the resist. Water vapor is introduced into a scanning electron microscope (SEM) vacuum chamber above a sample cooled down to 110 K. The vapor condenses, covering the sample with an amorphous layer of ice. To form a lift-off mask, ice is removed by the SEM electron beam (e-beam) guided by an e-beam lithography system. Without breaking vacuum, the sample with the ice mask is then transferred into a metal deposition chamber where metals are deposited by sputtering. The cold sample is then unloaded from the vacuum system and immersed in isopropanol at room temperature. As the ice melts, metal deposited on the ice disperses while the metals deposited on the sample where the ice had been removed by the e-beam remains. The instrument combines a high beam-current thermal field emission SEM fitted with an e-beam lithography system, cryogenic systems, and a high vacuum metal deposition system in a design that optimizes ice lithography for high throughput nanodevice fabrication. The nanoscale capability of the instrument is demonstrated with the fabrication of nanoscale metal lines.

  15. Quantum memories: emerging applications and recent advances

    PubMed Central

    Heshami, Khabat; England, Duncan G.; Humphreys, Peter C.; Bustard, Philip J.; Acosta, Victor M.; Nunn, Joshua; Sussman, Benjamin J.

    2016-01-01

    Quantum light–matter interfaces are at the heart of photonic quantum technologies. Quantum memories for photons, where non-classical states of photons are mapped onto stationary matter states and preserved for subsequent retrieval, are technical realizations enabled by exquisite control over interactions between light and matter. The ability of quantum memories to synchronize probabilistic events makes them a key component in quantum repeaters and quantum computation based on linear optics. This critical feature has motivated many groups to dedicate theoretical and experimental research to develop quantum memory devices. In recent years, exciting new applications, and more advanced developments of quantum memories, have proliferated. In this review, we outline some of the emerging applications of quantum memories in optical signal processing, quantum computation and non-linear optics. We review recent experimental and theoretical developments, and their impacts on more advanced photonic quantum technologies based on quantum memories.

  16. Quantum memories: emerging applications and recent advances

    NASA Astrophysics Data System (ADS)

    Heshami, Khabat; England, Duncan G.; Humphreys, Peter C.; Bustard, Philip J.; Acosta, Victor M.; Nunn, Joshua; Sussman, Benjamin J.

    2016-11-01

    Quantum light-matter interfaces are at the heart of photonic quantum technologies. Quantum memories for photons, where non-classical states of photons are mapped onto stationary matter states and preserved for subsequent retrieval, are technical realizations enabled by exquisite control over interactions between light and matter. The ability of quantum memories to synchronize probabilistic events makes them a key component in quantum repeaters and quantum computation based on linear optics. This critical feature has motivated many groups to dedicate theoretical and experimental research to develop quantum memory devices. In recent years, exciting new applications, and more advanced developments of quantum memories, have proliferated. In this review, we outline some of the emerging applications of quantum memories in optical signal processing, quantum computation and non-linear optics. We review recent experimental and theoretical developments, and their impacts on more advanced photonic quantum technologies based on quantum memories.

  17. Quantum memories: emerging applications and recent advances

    PubMed Central

    Heshami, Khabat; England, Duncan G.; Humphreys, Peter C.; Bustard, Philip J.; Acosta, Victor M.; Nunn, Joshua; Sussman, Benjamin J.

    2016-01-01

    Quantum light–matter interfaces are at the heart of photonic quantum technologies. Quantum memories for photons, where non-classical states of photons are mapped onto stationary matter states and preserved for subsequent retrieval, are technical realizations enabled by exquisite control over interactions between light and matter. The ability of quantum memories to synchronize probabilistic events makes them a key component in quantum repeaters and quantum computation based on linear optics. This critical feature has motivated many groups to dedicate theoretical and experimental research to develop quantum memory devices. In recent years, exciting new applications, and more advanced developments of quantum memories, have proliferated. In this review, we outline some of the emerging applications of quantum memories in optical signal processing, quantum computation and non-linear optics. We review recent experimental and theoretical developments, and their impacts on more advanced photonic quantum technologies based on quantum memories. PMID:27695198

  18. Recent advances in vacuum sciences and applications

    NASA Astrophysics Data System (ADS)

    Mozetič, M.; Ostrikov, K.; Ruzic, D. N.; Curreli, D.; Cvelbar, U.; Vesel, A.; Primc, G.; Leisch, M.; Jousten, K.; Malyshev, O. B.; Hendricks, J. H.; Kövér, L.; Tagliaferro, A.; Conde, O.; Silvestre, A. J.; Giapintzakis, J.; Buljan, M.; Radić, N.; Dražić, G.; Bernstorff, S.; Biederman, H.; Kylián, O.; Hanuš, J.; Miloševič, S.; Galtayries, A.; Dietrich, P.; Unger, W.; Lehocky, M.; Sedlarik, V.; Stana-Kleinschek, K.; Drmota-Petrič, A.; Pireaux, J. J.; Rogers, J. W.; Anderle, M.

    2014-04-01

    Recent advances in vacuum sciences and applications are reviewed. Novel optical interferometer cavity devices enable pressure measurements with ppm accuracy. The innovative dynamic vacuum standard allows for pressure measurements with temporal resolution of 2 ms. Vacuum issues in the construction of huge ultra-high vacuum devices worldwide are reviewed. Recent advances in surface science and thin films include new phenomena observed in electron transport near solid surfaces as well as novel results on the properties of carbon nanomaterials. Precise techniques for surface and thin-film characterization have been applied in the conservation technology of cultural heritage objects and recent advances in the characterization of biointerfaces are presented. The combination of various vacuum and atmospheric-pressure techniques enables an insight into the complex phenomena of protein and other biomolecule conformations on solid surfaces. Studying these phenomena at solid-liquid interfaces is regarded as the main issue in the development of alternative techniques for drug delivery, tissue engineering and thus the development of innovative techniques for curing cancer and cardiovascular diseases. A review on recent advances in plasma medicine is presented as well as novel hypotheses on cell apoptosis upon treatment with gaseous plasma. Finally, recent advances in plasma nanoscience are illustrated with several examples and a roadmap for future activities is presented.

  19. New Advanced Dielectric Materials for Accelerator Applications

    SciTech Connect

    Kanareykin, A.

    2010-11-04

    We present our recent results on the development and experimental testing of advanced dielectric materials that are capable of supporting the high RF electric fields generated by electron beams or pulsed high power microwaves. These materials have been optimized or specially designed for accelerator applications. The materials discussed here include low loss microwave ceramics, quartz, Chemical Vapor Deposition diamonds and nonlinear Barium Strontium Titanate based ferroelectrics.

  20. Tutorial: Advanced fault tree applications using HARP

    NASA Technical Reports Server (NTRS)

    Dugan, Joanne Bechta; Bavuso, Salvatore J.; Boyd, Mark A.

    1993-01-01

    Reliability analysis of fault tolerant computer systems for critical applications is complicated by several factors. These modeling difficulties are discussed and dynamic fault tree modeling techniques for handling them are described and demonstrated. Several advanced fault tolerant computer systems are described, and fault tree models for their analysis are presented. HARP (Hybrid Automated Reliability Predictor) is a software package developed at Duke University and NASA Langley Research Center that is capable of solving the fault tree models presented.

  1. New Advanced Dielectric Materials for Accelerator Applications

    NASA Astrophysics Data System (ADS)

    Kanareykin, A.

    2010-11-01

    We present our recent results on the development and experimental testing of advanced dielectric materials that are capable of supporting the high RF electric fields generated by electron beams or pulsed high power microwaves. These materials have been optimized or specially designed for accelerator applications. The materials discussed here include low loss microwave ceramics, quartz, Chemical Vapor Deposition diamonds and nonlinear Barium Strontium Titanate based ferroelectrics.

  2. Advanced Turbine Technology Applications Project (ATTAP)

    NASA Technical Reports Server (NTRS)

    1989-01-01

    Work to develop and demonstrate the technology of structural ceramics for automotive engines and similar applications is described. Long-range technology is being sought to produce gas turbine engines for automobiles with reduced fuel consumption and reduced environmental impact. The Advanced Turbine Technology Application Project (ATTAP) test bed engine is designed such that, when installed in a 3,000 pound inertia weight automobile, it will provide low emissions, 42 miles per gallon fuel economy on diesel fuel, multifuel capability, costs competitive with current spark ignition engines, and noise and safety characteristics that meet Federal standards.

  3. Spectrally Tunable Sources for Advanced Radiometric Applications.

    PubMed

    Brown, S W; Rice, J P; Neira, J E; Johnson, B C; Jackson, J D

    2006-01-01

    A common radiometric platform for the development of application-specific metrics to quantify the performance of sensors and systems is described. Using this platform, sensor and system performance may be quantified in terms of the accuracy of measurements of standardized sets of source distributions. The prototype platform consists of spectrally programmable light sources that can generate complex spectral distributions in the ultraviolet, visible and short-wave infrared regions for radiometric, photometric and colorimetric applications. In essence, the programmable spectral source is a radiometric platform for advanced instrument characterization and calibration that can also serve as a basis for algorithm testing and instrument comparison.

  4. Environmental Applications of Biosurfactants: Recent Advances

    PubMed Central

    Pacwa-Płociniczak, Magdalena; Płaza, Grażyna A.; Piotrowska-Seget, Zofia; Cameotra, Swaranjit Singh

    2011-01-01

    Increasing public awareness of environmental pollution influences the search and development of technologies that help in clean up of organic and inorganic contaminants such as hydrocarbons and metals. An alternative and eco-friendly method of remediation technology of environments contaminated with these pollutants is the use of biosurfactants and biosurfactant-producing microorganisms. The diversity of biosurfactants makes them an attractive group of compounds for potential use in a wide variety of industrial and biotechnological applications. The purpose of this review is to provide a comprehensive overview of advances in the applications of biosurfactants and biosurfactant-producing microorganisms in hydrocarbon and metal remediation technologies. PMID:21340005

  5. Communication services for advanced network applications.

    SciTech Connect

    Bresnahan, J.; Foster, I.; Insley, J.; Toonen, B.; Tuecke, S.

    1999-06-10

    Advanced network applications such as remote instrument control, collaborative environments, and remote I/O are distinguished by traditional applications such as videoconferencing by their need to create multiple, heterogeneous flows with different characteristics. For example, a single application may require remote I/O for raw datasets, shared controls for a collaborative analysis system, streaming video for image rendering data, and audio for collaboration. Furthermore, each flow can have different requirements in terms of reliability, network quality of service, security, etc. They argue that new approaches to communication services, protocols, and network architecture are required both to provide high-level abstractions for common flow types and to support user-level management of flow creation and quality. They describe experiences with the development of such applications and communication services.

  6. Advanced decision aiding techniques applicable to space

    NASA Technical Reports Server (NTRS)

    Kruchten, Robert J.

    1987-01-01

    RADC has had an intensive program to show the feasibility of applying advanced technology to Air Force decision aiding situations. Some aspects of the program, such as Satellite Autonomy, are directly applicable to space systems. For example, RADC has shown the feasibility of decision aids that combine the advantages of laser disks and computer generated graphics; decision aids that interface object-oriented programs with expert systems; decision aids that solve path optimization problems; etc. Some of the key techniques that could be used in space applications are reviewed. Current applications are reviewed along with their advantages and disadvantages, and examples are given of possible space applications. The emphasis is to share RADC experience in decision aiding techniques.

  7. EUV lithography cost of ownership analysis

    SciTech Connect

    Hawryluk, A.M.; Ceglio, N.M.

    1995-01-19

    The cost of fabricating state-of-the-art integrated circuits (ICs) has been increasing and it will likely be economic rather than technical factors that ultimately limit the progress of ICs toward smaller devices. It is estimated that lithography currently accounts for approximately one-third the total cost of fabricating modem ICs({sup 1}). It is expected that this factor will be fairly stable for the forseeable future, and as a result, any lithographic process must be cost-effective before it can be considered for production. Additionally, the capital equipment cost for a new fabrication facility is growing at an exponential rate (2); it will soon require a multibillion dollar investment in capital equipment alone to build a manufacturing facility. In this regard, it is vital that any advanced lithography candidate justify itself on the basis of cost effectiveness. EUV lithography is no exception and close attention to issues of wafer fabrication costs have been a hallmark of its early history. To date, two prior cost analyses have been conducted for EUV lithography (formerly called {open_quotes}Soft X-ray Projection Lithography{close_quotes}). The analysis by Ceglio, et. al., provided a preliminary system design, set performance specifications and identified critical technical issues for cost control. A follow-on analysis by Early, et.al., studied the impact of issues such as step time, stepper overhead, tool utilization, escalating photoresist costs and limited reticle usage on wafer exposure costs. This current study provides updated system designs and specifications and their impact on wafer exposure costs. In addition, it takes a first cut at a preliminary schematic of an EUVL fabrication facility along with an estimate of the capital equipment costs for such a facility.

  8. Advanced Applications of RNA Sequencing and Challenges.

    PubMed

    Han, Yixing; Gao, Shouguo; Muegge, Kathrin; Zhang, Wei; Zhou, Bing

    2015-01-01

    Next-generation sequencing technologies have revolutionarily advanced sequence-based research with the advantages of high-throughput, high-sensitivity, and high-speed. RNA-seq is now being used widely for uncovering multiple facets of transcriptome to facilitate the biological applications. However, the large-scale data analyses associated with RNA-seq harbors challenges. In this study, we present a detailed overview of the applications of this technology and the challenges that need to be addressed, including data preprocessing, differential gene expression analysis, alternative splicing analysis, variants detection and allele-specific expression, pathway analysis, co-expression network analysis, and applications combining various experimental procedures beyond the achievements that have been made. Specifically, we discuss essential principles of computational methods that are required to meet the key challenges of the RNA-seq data analyses, development of various bioinformatics tools, challenges associated with the RNA-seq applications, and examples that represent the advances made so far in the characterization of the transcriptome.

  9. Advanced Applications of RNA Sequencing and Challenges

    PubMed Central

    Han, Yixing; Gao, Shouguo; Muegge, Kathrin; Zhang, Wei; Zhou, Bing

    2015-01-01

    Next-generation sequencing technologies have revolutionarily advanced sequence-based research with the advantages of high-throughput, high-sensitivity, and high-speed. RNA-seq is now being used widely for uncovering multiple facets of transcriptome to facilitate the biological applications. However, the large-scale data analyses associated with RNA-seq harbors challenges. In this study, we present a detailed overview of the applications of this technology and the challenges that need to be addressed, including data preprocessing, differential gene expression analysis, alternative splicing analysis, variants detection and allele-specific expression, pathway analysis, co-expression network analysis, and applications combining various experimental procedures beyond the achievements that have been made. Specifically, we discuss essential principles of computational methods that are required to meet the key challenges of the RNA-seq data analyses, development of various bioinformatics tools, challenges associated with the RNA-seq applications, and examples that represent the advances made so far in the characterization of the transcriptome. PMID:26609224

  10. Advanced Turbine Technology Applications Project (ATTAP)

    NASA Technical Reports Server (NTRS)

    1994-01-01

    Reports technical effort by AlliedSignal Engines in sixth year of DOE/NASA funded project. Topics include: gas turbine engine design modifications of production APU to incorporate ceramic components; fabrication and processing of silicon nitride blades and nozzles; component and engine testing; and refinement and development of critical ceramics technologies, including: hot corrosion testing and environmental life predictive model; advanced NDE methods for internal flaws in ceramic components; and improved carbon pulverization modeling during impact. ATTAP project is oriented toward developing high-risk technology of ceramic structural component design and fabrication to carry forward to commercial production by 'bridging the gap' between structural ceramics in the laboratory and near-term commercial heat engine application. Current ATTAP project goal is to support accelerated commercialization of advanced, high-temperature engines for hybrid vehicles and other applications. Project objectives are to provide essential and substantial early field experience demonstrating ceramic component reliability and durability in modified, available, gas turbine engine applications; and to scale-up and improve manufacturing processes of ceramic turbine engine components and demonstrate application of these processes in the production environment.

  11. Impacts of cost functions on inverse lithography patterning.

    PubMed

    Yu, Jue-Chin; Yu, Peichen

    2010-10-25

    For advanced CMOS processes, inverse lithography promises better patterning fidelity than conventional mask correction techniques due to a more complete exploration of the solution space. However, the success of inverse lithography relies highly on customized cost functions whose design and know-how have rarely been discussed. In this paper, we investigate the impacts of various objective functions and their superposition for inverse lithography patterning using a generic gradient descent approach. We investigate the most commonly used objective functions, which are the resist and aerial images, and also present a derivation for the aerial image contrast. We then discuss the resulting pattern fidelity and final mask characteristics for simple layouts with a single isolated contact and two nested contacts. We show that a cost function composed of a dominant resist-image component and a minor aerial-image or image-contrast component can achieve a good mask correction and contour targets when using inverse lithography patterning.

  12. Extreme ultraviolet Talbot interference lithography.

    PubMed

    Li, Wei; Marconi, Mario C

    2015-10-01

    Periodic nanopatterns can be generated using lithography based on the Talbot effect or optical interference. However, these techniques have restrictions that limit their performance. High resolution Talbot lithography is limited by the very small depth of focus and the demanding requirements in the fabrication of the master mask. Interference lithography, with large DOF and high resolution, is limited to simple periodic patterns. This paper describes a hybrid extreme ultraviolet lithography approach that combines Talbot lithography and interference lithography to render an interference pattern with a lattice determined by a Talbot image. As a result, the method enables filling the arbitrary shaped cells produced by the Talbot image with interference patterns. Detailed modeling, system design and experimental results using a tabletop EUV laser are presented. PMID:26480070

  13. Evolution in the concentration of activities in lithography

    NASA Astrophysics Data System (ADS)

    Levinson, Harry J.

    2016-03-01

    From a perusal of the proceedings of the SPIE Advanced Lithography Symposium, the progression of new concepts in lithographic technology can be seen. A new idea first appears in a few papers, and over time, there is an increase in the number of papers on the same topic. Eventually the method becomes commonplace, and the number of papers on the topic declines, as the idea becomes part of our industry's working knowledge. For example, one or two papers on resolution enhancement techniques (RETs) appeared in the proceedings of the Optical Microlithography Conference in 1989 and 1990. By 1994, the total number of papers had increased to 35. Early lithographers focused on practical issues, such as adhesion promotion and resist edge bead. The introduction of simulation software brought on the next era of lithography. This was followed by a period of time in which RETs were developed and brought to maturity. The introduction of optical proximity corrections (OPC) initiated the next major era of lithography. The traditional path for scaling by using shorter wavelengths, decreasing k1 and increasing numerical aperture has given way to the current era of optical multiple patterning and lithography-design co-optimization. There has been sufficient activity in EUV lithography R and D to justify a separate EUV Lithography Conference as part of the annual Advanced Lithography Symposium. Each era builds on the cumulative knowledge gained previously. Over time, there have been parallel developments in optics, exposure tools, resist, metrology and mask technology, many of which were associated with changes in the wavelength of light used for leading-edge lithography.

  14. Improved near field lithography by surface plasmon resonance

    NASA Astrophysics Data System (ADS)

    Zeng, Beibei; Zhao, Yanhui; Fang, Liang; Wang, Changtao; Luo, Xiangang

    2009-05-01

    Conventionally, the finest pattern obtained in optical lithography is determined by wavelength and numerical aperture of optical system, due to diffraction effect. This principle delivers theoretical obstacles for nano lithography using conventional light source, like Hg lamp. According to theory, this obstacle can be circumvented with near field lithography (NFL) technique, just by confining the mask and photo resist into sub-wavelength dimensions. Sub-wavelength patterns with features down to 100nm can be realized in the NFL, as demonstrated numerically and experimentally in many papers. One obvious problem associated with NFL is that low efficiency in the lithography process, since it is difficult to transmit through sub-wavelength scaled apertures in the mask. This usually results in the deleterious effect to the patterns on photo resist. In this paper, we demonstrate that the extraordinary optical transmission (EOT) effect helps to solve this problem. It is found that noble metal, instead of chromium, usually gives much greater transmission when employed as mask material. The enhancement is contributed to resonant excitation of surface plasmon mode. Further, the transmission can be enhanced by appropriately design of patterns. The polarization of illumination light affects lithography efficiency as well. As illustrative examples, mask patterns like lines group, grating structure and holes array are designed and simulated with greatly improved lithography efficiency. This method is believed to have potential applications in nano lithography.

  15. Defect tolerant transmission lithography mask

    DOEpatents

    Vernon, Stephen P.

    2000-01-01

    A transmission lithography mask that utilizes a transparent substrate or a partially transparent membrane as the active region of the mask. A reflective single layer or multilayer coating is deposited on the membrane surface facing the illumination system. The coating is selectively patterned (removed) to form transmissive (bright) regions. Structural imperfections and defects in the coating have negligible effect on the aerial image of the mask master pattern since the coating is used to reflect radiation out of the entrance pupil of the imaging system. Similarly, structural imperfections in the clear regions of the membrane have little influence on the amplitude or phase of the transmitted electromagnetic fields. Since the mask "discards," rather than absorbs, unwanted radiation, it has reduced optical absorption and reduced thermal loading as compared to conventional designs. For EUV applications, the mask circumvents the phase defect problem, and is independent of the thermal load during exposure.

  16. Method for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, Glenn D.

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  17. Method for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, G. D.

    2000-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  18. Advanced Energetics for Aeronautical Applications. Volume II

    NASA Technical Reports Server (NTRS)

    Alexander, David S.

    2005-01-01

    NASA has identified water vapor emission into the upper atmosphere from commercial transport aircraft, particularly as it relates to the formation of persistent contrails, as a potential environmental problem. Since 1999, MSE has been working with NASA-LaRC to investigate the concept of a transport-size emissionless aircraft fueled with liquid hydrogen combined with other possible breakthrough technologies. The goal of the project is to significantly advance air transportation in the next decade and beyond. The power and propulsion (P/P) system currently being studied would be based on hydrogen fuel cells (HFCs) powering electric motors, which drive fans for propulsion. The liquid water reaction product is retained onboard the aircraft until a flight mission is completed. As of now, NASA-LaRC and MSE have identified P/P system components that, according to the high-level analysis conducted to date, are light enough to make the emissionless aircraft concept feasible. Calculated maximum aircraft ranges (within a maximum weight constraint) and other performance predictions are included in this report. This report also includes current information on advanced energy-related technologies, which are still being researched, as well as breakthrough physics concepts that may be applicable for advanced energetics and aerospace propulsion in the future.

  19. Automotive applications for advanced composite materials

    NASA Technical Reports Server (NTRS)

    Deutsch, G. C.

    1978-01-01

    A description is presented of nonaerospace applications for advanced composite materials with special emphasis on the automotive applications. The automotive industry has to satisfy exacting requirements to reduce the average fuel consumption of cars. A feasible approach to accomplish this involves the development of composites cars with a total weight of 2400 pounds and a fuel consumption of 33 miles per gallon. In connection with this possibility, the automotive companies have started to look seriously at composite materials. The aerospace industry has over the past decade accumulated a considerable data base on composite materials and this is being made available to the nonaerospace sector. However, the automotive companies will place prime emphasis on low cost resins which lend themselves to rapid fabrication techniques.

  20. Advanced science and applications space platform

    NASA Technical Reports Server (NTRS)

    White, J.; Runge, F. C.

    1981-01-01

    Requirements for and descriptions of the mission equipment, subsystems, configuration, utilities, and interfaces for an Advanced Science and Applications Space Platform (ASASP) are developed using large space structure technology. Structural requirements and attitude control system concepts are emphasized. To support the development of ASASP requirements, a mission was described that would satisfy the requirements of a representative set of payloads requiring large separation distances selected from the Science and Applications Space Platform data base. Platform subsystems are defined which support the payload requirements and a physical platform concept is developed. Structural system requirements which include utilities accommodation, interface requirements, and platform strength and stiffness requirements are developed. An attitude control system concept is also described. The resultant ASASP is analyzed and technological developments deemed necessary in the area of large space systems are recommended.

  1. Mission applications for advanced photovoltaic solar arrays

    NASA Technical Reports Server (NTRS)

    Stella, Paul M.; West, John L.; Chave, Robert G.; Mcgee, David P.; Yen, Albert S.

    1990-01-01

    The suitability of the Advanced Photovoltaic Solar Array (APSA) for future space missions was examined by considering the impact on the spacecraft system in general. The lightweight flexible blanket array system was compared to rigid arrays and a radio-isotope thermoelectric generator (RTG) static power source for a wide range of assumed future earth orbiting and interplanetary mission applications. The study approach was to establish assessment criteria and a rating scheme, identify a reference mission set, perform the power system assessment for each mission, and develop conclusions and recommendations to guide future APSA technology development. The authors discuss the three selected power sources, the assessment criteria and rating definitions, and the reference missions. They present the assessment results in a convenient tabular format. It is concluded that the three power sources examined, APSA, conventional solar arrays, and RTGs, can be considered to complement each other. Each power technology has its own range of preferred applications.

  2. Advances in hypersonic vehicle synthesis with application to studies of advanced thermal protection system

    NASA Technical Reports Server (NTRS)

    Ardema, Mark D.

    1995-01-01

    This report summarizes the work entitled 'Advances in Hypersonic Vehicle Synthesis with Application to Studies of Advanced Thermal Protection Systems.' The effort was in two areas: (1) development of advanced methods of trajectory and propulsion system optimization; and (2) development of advanced methods of structural weight estimation. The majority of the effort was spent in the trajectory area.

  3. 12 CFR 950.2 - Authorization and application for advances; obligation to repay advances.

    Code of Federal Regulations, 2010 CFR

    2010-01-01

    ... 12 Banks and Banking 7 2010-01-01 2010-01-01 false Authorization and application for advances; obligation to repay advances. 950.2 Section 950.2 Banks and Banking FEDERAL HOUSING FINANCE BOARD FEDERAL HOME LOAN BANK ASSETS AND OFF-BALANCE SHEET ITEMS ADVANCES Advances to Members § 950.2...

  4. Advances in hypersonic vehicle synthesis with application to studies of advanced thermal protection system

    NASA Astrophysics Data System (ADS)

    Ardema, Mark D.

    1995-09-01

    This report summarizes the work entitled 'Advances in Hypersonic Vehicle Synthesis with Application to Studies of Advanced Thermal Protection Systems.' The effort was in two areas: (1) development of advanced methods of trajectory and propulsion system optimization; and (2) development of advanced methods of structural weight estimation. The majority of the effort was spent in the trajectory area.

  5. HIAD Advancements and Extension of Mission Applications

    NASA Technical Reports Server (NTRS)

    Johnson, R. Keith; Cheatwood, F. McNeil; Calomino, Anthony M.; Hughes, Stephen J.; Korzun, Ashley M.; DiNonno, John M.; Lindell, Mike C.; Swanson, Greg T.

    2016-01-01

    The Hypersonic Inflatable Aerodynamic Decelerator (HIAD) technology has made significant advancements over the last decade with flight test demonstrations and ground development campaigns. The first generation (Gen-1) design and materials were flight tested with the successful third Inflatable Reentry Vehicle Experiment flight test of a 3-m HIAD (IRVE-3). Ground development efforts incorporated materials with higher thermal capabilities for the inflatable structure (IS) and flexible thermal protection system (F-TPS) as a second generation (Gen-2) system. Current efforts and plans are focused on extending capabilities to improve overall system performance and reduce areal weight, as well as expand mission applicability. F-TPS materials that offer greater thermal resistance, and ability to be packed to greater density, for a given thickness are being tested to demonstrated thermal performance benefits and manufacturability at flight-relevant scale. IS materials and construction methods are being investigated to reduce mass, increase load capacities, and improve durability for packing. Previous HIAD systems focused on symmetric geometries using stacked torus construction. Flight simulations and trajectory analysis show that symmetrical HIADs may provide L/D up to 0.25 via movable center of gravity (CG) offsets. HIAD capabilities can be greatly expanded to suit a broader range of mission applications with asymmetric shapes and/or modulating L/D. Various HIAD concepts are being developed to provide greater control to improve landing accuracy and reduce dependency upon propulsion systems during descent and landing. Concepts being studied include a canted stack torus design, control surfaces, and morphing configurations that allow the shape to be actively manipulated for flight control. This paper provides a summary of recent HIAD development activities, and plans for future HIAD developments including advanced materials, improved construction techniques, and alternate

  6. Development of ballistic hot electron emitter and its applications to parallel processing: active-matrix massive direct-write lithography in vacuum and thin films deposition in solutions

    NASA Astrophysics Data System (ADS)

    Koshida, N.; Kojima, A.; Ikegami, N.; Suda, R.; Yagi, M.; Shirakashi, J.; Yoshida, T.; Miyaguchi, H.; Muroyama, M.; Nishino, H.; Yoshida, S.; Sugata, M.; Totsu, K.; Esashi, M.

    2015-03-01

    Making the best use of the characteristic features in nanocrystalline Si (nc-Si) ballistic hot electron source, the alternative lithographic technology is presented based on the two approaches: physical excitation in vacuum and chemical reduction in solutions. The nc-Si cold cathode is a kind of metal-insulator-semiconductor (MIS) diode, composed of a thin metal film, an nc-Si layer, an n+-Si substrate, and an ohmic back contact. Under a biased condition, energetic electrons are uniformly and directionally emitted through the thin surface electrodes. In vacuum, this emitter is available for active-matrix drive massive parallel lithography. Arrayed 100×100 emitters (each size: 10×10 μm2, pitch: 100 μm) are fabricated on silicon substrate by conventional planar process, and then every emitter is bonded with integrated complementary metal-oxide-semiconductor (CMOS) driver using through-silicon-via (TSV) interconnect technology. Electron multi-beams emitted from selected devices are focused by a micro-electro-mechanical system (MEMS) condenser lens array and introduced into an accelerating system with a demagnification factor of 100. The electron accelerating voltage is 5 kV. The designed size of each beam landing on the target is 10×10 nm2 in square. Here we discuss the fabrication process of the emitter array with TSV holes, implementation of integrated ctive-matrix driver circuit, the bonding of these components, the construction of electron optics, and the overall operation in the exposure system including the correction of possible aberrations. The experimental results of this mask-less parallel pattern transfer are shown in terms of simple 1:1 projection and parallel lithography under an active-matrix drive scheme. Another application is the use of this emitter as an active electrode supplying highly reducing electrons into solutions. A very small amount of metal-salt solutions is dripped onto the nc-Si emitter surface, and the emitter is driven without

  7. Application development environment for advanced digital workstations

    NASA Astrophysics Data System (ADS)

    Valentino, Daniel J.; Harreld, Michael R.; Liu, Brent J.; Brown, Matthew S.; Huang, Lu J.

    1998-06-01

    One remaining barrier to the clinical acceptance of electronic imaging and information systems is the difficulty in providing intuitive access to the information needed for a specific clinical task (such as reaching a diagnosis or tracking clinical progress). The purpose of this research was to create a development environment that enables the design and implementation of advanced digital imaging workstations. We used formal data and process modeling to identify the diagnostic and quantitative data that radiologists use and the tasks that they typically perform to make clinical decisions. We studied a diverse range of radiology applications, including diagnostic neuroradiology in an academic medical center, pediatric radiology in a children's hospital, screening mammography in a breast cancer center, and thoracic radiology consultation for an oncology clinic. We used object- oriented analysis to develop software toolkits that enable a programmer to rapidly implement applications that closely match clinical tasks. The toolkits support browsing patient information, integrating patient images and reports, manipulating images, and making quantitative measurements on images. Collectively, we refer to these toolkits as the UCLA Digital ViewBox toolkit (ViewBox/Tk). We used the ViewBox/Tk to rapidly prototype and develop a number of diverse medical imaging applications. Our task-based toolkit approach enabled rapid and iterative prototyping of workstations that matched clinical tasks. The toolkit functionality and performance provided a 'hands-on' feeling for manipulating images, and for accessing textual information and reports. The toolkits directly support a new concept for protocol based-reading of diagnostic studies. The design supports the implementation of network-based application services (e.g., prefetching, workflow management, and post-processing) that will facilitate the development of future clinical applications.

  8. Advanced Stirling conversion systems for terrestrial applications

    NASA Technical Reports Server (NTRS)

    Shaltens, R. K.

    1987-01-01

    Under the Department of Energy's (DOE) Solar Thermal Technology Program, Sandia National Laboratories (SNLA) is developing heat engines for terrestrial Solar Distributed Heat Receivers. SNLA has identified the Stirling to be one of the most promising candidates for the terrestrial applications. The free-piston Stirling engine (FPSE) has the potential to meet the DOE goals for both performance and cost. The National Aeronautics and Space Administration (NASA) Lewis Research Center (LeRC) is conducting free-piston Stirling activities which are directed toward a dynamic power source for space applications. Space power system requirements include high efficiency, very long life, high reliability and low vibration. The FPSE has the potential for future high power space conversion systems, either solar or nuclear. Generic free-piston technology is currently being developed by LeRC for DOE/ORNL for use with a residential heat pump under an Interagency Agreement. Since 1983, the SP-100 Program (DOD/NASA/DOE) is developing dynamic power sources for space. Although both applications (heat pump and space power) appear to be quite different, their requirements complement each other. A cooperative Interagency Agreement (IAA) was signed in 1985 with NASA Lewis to provide technical management for an Advanced Stirling Conversion System (ASCS) for SNLA. Conceptual design(s) using a free-piston Stirling (FPSE), and a heat pipe will be discussed. The ASCS will be designed using technology which can reasonably be expected to be available in the 1980's.

  9. Advanced teleoperation: Technology innovations and applications

    NASA Technical Reports Server (NTRS)

    Schenker, Paul S.; Bejczy, Antal K.; Kim, Won S.

    1994-01-01

    The capability to remotely, robotically perform space assembly, inspection, servicing, and science functions would rapidly expand our presence in space, and the cost efficiency of being there. There is considerable interest in developing 'telerobotic' technologies, which also have comparably important terrestrial applications to health care, underwater salvage, nuclear waste remediation and other. Such tasks, both space and terrestrial, require both a robot and operator interface that is highly flexible and adaptive, i.e., capable of efficiently working in changing and often casually structured environments. One systems approach to this requirement is to augment traditional teleoperation with computer assists -- advanced teleoperation. We have spent a number of years pursuing this approach, and highlight some key technology developments and their potential commercial impact. This paper is an illustrative summary rather than self-contained presentation; for completeness, we include representative technical references to our work which will allow the reader to follow up items of particular interest.

  10. Surface plasmon resonance biosensors: advances and applications

    NASA Astrophysics Data System (ADS)

    Homola, Jirí

    2009-10-01

    Surface plasmon resonance (SPR) biosensors represent the most advanced label-free optical affinity biosensor technology. In the last decade numerous SPR sensor platforms have been developed and applied in the life sciences and bioanalytics. This contribution reviews the state of the art in the development of SPR (bio)sensor technology and presents selected results of research into SPR biosensors at the Institute of Photonics and Electronics, Prague. The developments discussed in detail include a miniature fiber optic SPR sensor for localized measurements, a compact SPR sensor for field use and a multichannel SPR sensor for high-throughput screening. Examples of applications for the detection of analytes related to medical diagnostics (biomarkers, hormones, antibodies), environmental monitoring (endocrine disrupting compounds), and food safety (pathogens and toxins) are given.

  11. Advanced Turbine Technology Applications Project (ATTAP)

    NASA Technical Reports Server (NTRS)

    1993-01-01

    This report is the fifth in a series of Annual Technical Summary Reports for the Advanced Turbine Technology Applications Project (ATTAP), sponsored by the U.S. Department of Energy (DOE). The report was prepared by Garrett Auxiliary Power Division (GAPD), a unit of Allied-Signal Aerospace Company, a unit of Allied Signal, Inc. The report includes information provided by Garrett Ceramic Components, and the Norton Advanced Ceramics Company, (formerly Norton/TRW Ceramics), subcontractors to GAPD on the ATTAP. This report covers plans and progress on ceramics development for commercial automotive applications over the period 1 Jan. through 31 Dec. 1992. Project effort conducted under this contract is part of the DOE Gas Turbine Highway Vehicle System program. This program is directed to provide the U.S. automotive industry the high-risk, long-range technology necessary to produce gas turbine engines for automobiles with reduced fuel consumption, reduced environmental impact, and a decreased reliance on scarce materials and resources. The program is oriented toward developing the high-risk technology of ceramic structural component design and fabrication, such that industry can carry this technology forward to production in the 1990's. The ATTAP test bed engine, carried over from the previous AGT101 project, is being used for verification testing of the durability of next generation ceramic components, and their suitability for service at Reference Powertrain Design conditions. This document reports the technical effort conducted by GAPD and the ATTAP subcontractors during the fifth year of the project. Topics covered include ceramic processing definition and refinement, design improvements to the ATTAP test bed engine and test rigs, and the methodology development of ceramic impact and fracture mechanisms. Appendices include reports by ATTAP subcontractors in the development of silicon nitride materials and processes.

  12. Plan for advanced microelectronics processing technology application. Final report

    SciTech Connect

    Goland, A.N.

    1990-10-01

    The ultimate objective of the tasks described in the research agreement was to identify resources primarily, but not exclusively, within New York State that are available for the development of a Center for Advanced Microelectronics Processing (CAMP). Identification of those resources would enable Brookhaven National Laboratory to prepare a program plan for the CAMP. In order to achieve the stated goal, the principal investigators undertook to meet the key personnel in relevant NYS industrial and academic organizations to discuss the potential for economic development that could accompany such a Center and to gauge the extent of participation that could be expected from each interested party. Integrated of these discussions was to be achieved through a workshop convened in the summer of 1990. The culmination of this workshop was to be a report (the final report) outlining a plan for implementing a Center in the state. As events unfolded, it became possible to identify the elements of a major center for x-ray lithography on Lone Island at Brookhaven National Laboratory. The principal investigators were than advised to substitute a working document based upon that concept in place of a report based upon the more general CAMP workshop originally envisioned. Following that suggestion from the New York State Science and Technology Foundation, the principals established a working group consisting of representatives of the Grumman Corporation, Columbia University, the State University of New York at Stony Brook, and Brookhaven National Laboratory. Regular meetings and additional communications between these collaborators have produced a preproposal that constitutes the main body of the final report required by the contract. Other components of this final report include the interim report and a brief description of the activities which followed the establishment of the X-ray Lithography Center working group.

  13. A new architecture as transparent electrodes for solar and IR applications based on photonic structures via soft lithography

    SciTech Connect

    Kuang, Ping

    2011-01-01

    Transparent conducting electrodes with the combination of high optical transmission and good electrical conductivity are essential for solar energy harvesting and electric lighting devices. Currently, indium tin oxide (ITO) is used because ITO offers relatively high transparency (>80%) to visible light and low sheet resistance (Rs = 10 ohms/square (Ω /2)) for electrical conduction. However, ITO is costly due to limited indium reserves, and it is brittle. These disadvantages have motivated the search for other conducting electrodes with similar or better properties. There has been research on a variety of electrode structures involving carbon nanotube networks, graphene films, nanowire and nanopatterned meshes and grids. Due to their novel characteristics in light manipulation and collection, photonic crystal structures show promise for further improvement. Here, we report on a new architecture consisting of nanoscale high aspect ratio metallic photonic structures as transparent electrodes fabricated via a combination of processes. For (Au) and silver (Ag) structures, the visible light transmission can reach as high as 80%, and the sheet resistance of the structure can be as low as 3.2Ω /2. The optical transparency of the high aspect ratio metal structures at visible wavelength range is comparable to that of ITO glass, while their sheet resistance is more than 3 times lower, which indicates a much higher electrical conductivity of the metal structures. Furthermore, the high aspect ratio metal structures have very high infrared (IR) reflection (90%) for the transverse magnetic (TM) mode, which can lead to the development of fabrication of metallic structures as IR filters for heat control applications. Investigations of interdigitated structures based on the high aspect ratio metal electrodes are ongoing to study the feasibility in smart window applications in light transmission modulation.

  14. Reflective electron-beam lithography performance for the 10nm logic node

    NASA Astrophysics Data System (ADS)

    Freed, Regina; Gubiotti, Thomas; Sun, Jeff; Cheung, Anthony; Yang, Jason; McCord, Mark; Petric, Paul; Carroll, Allen; Ummethala, Upendra; Hale, Layton; Hench, John; Kojima, Shinichi; Mieher, Walter; Bevis, Chris F.

    2012-11-01

    Maskless electron beam lithography has the potential to extend semiconductor manufacturing to the sub-10 nm technology node. KLA-Tencor is currently developing Reflective Electron Beam Lithography (REBL) for high-volume 10 nm logic (16 nm HP). This paper reviews progress in the development of the REBL system towards its goal of 100 wph throughput for High Volume Lithography (HVL) at the 2X and 1X nm nodes. In this paper we introduce the Digital Pattern Generator (DPG) with integrated CMOS and MEMs lenslets that was manufactured at TSMC and IMEC. For REBL, the DPG is integrated to KLA-Tencor pattern generating software that can be programmed to produce complex, gray-scaled lithography patterns. Additionally, we show printing results for a range of interesting lithography patterns using Time Domain Imaging (TDI). Previously, KLA-Tencor reported on the development of a Reflective Electron Beam Lithography (REBL) tool for maskless lithography at and below the 22 nm technology node1. Since that time, the REBL team and its partners (TSMC, IMEC) have made good progress towards developing the REBL system and Digital Pattern Generator (DPG) for direct write lithography. Traditionally, e-beam direct write lithography has been too slow for most lithography applications. Ebeam direct write lithography has been used for mask writing rather than wafer processing since the maximum blur requirements limit column beam current - which drives e-beam throughput. To print small features and a fine pitch with an e-beam tool requires a sacrifice in processing time unless one significantly increases the total number of beams on a single writing tool. Because of the continued uncertainty with regards to the optical lithography roadmap beyond the 22 nm technology node, the semiconductor equipment industry is in the process of designing and testing e-beam lithography tools with the potential for HVL.

  15. Advanced Turbine Technology Applications Project (ATTAP)

    NASA Technical Reports Server (NTRS)

    1992-01-01

    This report is the fourth in a series of Annual Technical Summary Reports for the Advanced Turbine Technology Applications Project (ATTAP). This report covers plans and progress on ceramics development for commercial automotive applications over the period 1 Jan. - 31 Dec. 1991. Project effort conducted under this contract is part of the DOE Gas Turbine Highway Vehicle System program. This program is directed to provide the U.S. automotive industry the high-risk, long-range technology necessary to produce gas turbine engines for automobiles with reduced fuel consumption, reduced environmental impact, and a decreased reliance on scarce materials and resources. The program is oriented toward developing the high-risk technology of ceramic structural component design and fabrication, such that industry can carry this technology forward to production in the 1990s. The ATTAP test bed engine, carried over from the previous AGT101 project, is being used for verification testing of the durability of next-generation ceramic components, and their suitability for service at Reference Powertrain Design conditions. This document reports the technical effort conducted by GAPD and the ATTAP subcontractors during the fourth year of the project. Topics covered include ceramic processing definition and refinement, design improvements to the ATTAP test bed engine and test rigs and the methodology development of ceramic impact and fracture mechanisms. Appendices include reports by ATTAP subcontractors in the development of silicon nitride and silicon carbide families of materials and processes.

  16. Advanced Stirling conversion systems for terrestrial applications

    SciTech Connect

    Shaltens, R.K.

    1987-01-01

    Sandia National Laboratories (SNLA) is developing heat engines for terrestrial Solar distributed Heat Receivers. SNLA has identified the Stirling to be one of the most promising candidates for the terrestrial applications. The free-piston Stirling engine (FPSE) has the potential to meet the DOE goals for both performance and cost. Free-piston Stirling activities which are directed toward a dynamic power source for the space application are being conducted. Space power system requirements include high efficiency, very long life, high reliability and low vibration. The FPSE has the potential for future high power space conversion systems, either solar or nuclear powered. Generic free-piston technology is currently being developed for use with a residential heat pump under an Interagency Agreement. Also, an overview is presented of proposed conceptual designs for the Advanced Stirling Conversion System (ASCS) using a free-piston Stirling engine and a liquid metal heat pipe receiver. Power extraction includes both a linear alternator and hydraulic output capable of delivering approximately 25 kW of electrical power to the electric utility grid. Target cost of the engine/alternator is 300 dollars per kilowatt at a manufacturing rate of 10,000 units per year. The design life of the ASCS is 60,000 h (30 y) with an engine overhaul at 40,000 h (20 y). Also discussed are the key features and characteristics of the ASCS conceptual designs.

  17. Advanced flow MRI: emerging techniques and applications.

    PubMed

    Markl, M; Schnell, S; Wu, C; Bollache, E; Jarvis, K; Barker, A J; Robinson, J D; Rigsby, C K

    2016-08-01

    Magnetic resonance imaging (MRI) techniques provide non-invasive and non-ionising methods for the highly accurate anatomical depiction of the heart and vessels throughout the cardiac cycle. In addition, the intrinsic sensitivity of MRI to motion offers the unique ability to acquire spatially registered blood flow simultaneously with the morphological data, within a single measurement. In clinical routine, flow MRI is typically accomplished using methods that resolve two spatial dimensions in individual planes and encode the time-resolved velocity in one principal direction, typically oriented perpendicular to the two-dimensional (2D) section. This review describes recently developed advanced MRI flow techniques, which allow for more comprehensive evaluation of blood flow characteristics, such as real-time flow imaging, 2D multiple-venc phase contrast MRI, four-dimensional (4D) flow MRI, quantification of complex haemodynamic properties, and highly accelerated flow imaging. Emerging techniques and novel applications are explored. In addition, applications of these new techniques for the improved evaluation of cardiovascular (aorta, pulmonary arteries, congenital heart disease, atrial fibrillation, coronary arteries) as well as cerebrovascular disease (intra-cranial arteries and veins) are presented. PMID:26944696

  18. Programmable imprint lithography template

    DOEpatents

    Cardinale, Gregory F.; Talin, Albert A.

    2006-10-31

    A template for imprint lithography (IL) that reduces significantly template production costs by allowing the same template to be re-used for several technology generations. The template is composed of an array of spaced-apart moveable and individually addressable rods or plungers. Thus, the template can be configured to provide a desired pattern by programming the array of plungers such that certain of the plungers are in an "up" or actuated configuration. This arrangement of "up" and "down" plungers forms a pattern composed of protruding and recessed features which can then be impressed onto a polymer film coated substrate by applying a pressure to the template impressing the programmed configuration into the polymer film. The pattern impressed into the polymer film will be reproduced on the substrate by subsequent processing.

  19. Method for maskless lithography

    DOEpatents

    Sweatt, William C.; Stulen, Richard H.

    2000-01-01

    The present invention provides a method for maskless lithography. A plurality of individually addressable and rotatable micromirrors together comprise a two-dimensional array of micromirrors. Each micromirror in the two-dimensional array can be envisioned as an individually addressable element in the picture that comprises the circuit pattern desired. As each micromirror is addressed it rotates so as to reflect light from a light source onto a portion of the photoresist coated wafer thereby forming a pixel within the circuit pattern. By electronically addressing a two-dimensional array of these micromirrors in the proper sequence a circuit pattern that is comprised of these individual pixels can be constructed on a microchip. The reflecting surface of the micromirror is configured in such a way as to overcome coherence and diffraction effects in order to produce circuit elements having straight sides.

  20. Advances in artificial olfaction: sensors and applications.

    PubMed

    Gutiérrez, J; Horrillo, M C

    2014-06-01

    The artificial olfaction, based on electronic systems (electronic noses), includes three basic functions that operate on an odorant: a sample handler, an array of gas sensors, and a signal-processing method. The response of these artificial systems can be the identity of the odorant, an estimate concentration of the odorant, or characteristic properties of the odour as might be perceived by a human. These electronic noses are bio inspired instruments that mimic the sense of smell. The complexity of most odorants makes characterisation difficult with conventional analysis techniques, such as gas chromatography. Sensory analysis by a panel of experts is a costly process since it requires trained people who can work for only relatively short periods of time. The electronic noses are easy to build, provide short analysis times, in real time and on-line, and show high sensitivity and selectivity to the tested odorants. These systems are non-destructive techniques used to characterise odorants in diverse applications linked with the quality of life such as: control of foods, environmental quality, citizen security or clinical diagnostics. However, there is much research still to be done especially with regard to new materials and sensors technology, data processing, interpretation and validation of results. This work examines the main features of modern electronic noses and their most important applications in the environmental, and security fields. The above mentioned main components of an electronic nose (sample handling system, more advanced materials and methods for sensing, and data processing system) are described. Finally, some interesting remarks concerning the strengths and weaknesses of electronic noses in the different applications are also mentioned. PMID:24767451

  1. Advances in artificial olfaction: sensors and applications.

    PubMed

    Gutiérrez, J; Horrillo, M C

    2014-06-01

    The artificial olfaction, based on electronic systems (electronic noses), includes three basic functions that operate on an odorant: a sample handler, an array of gas sensors, and a signal-processing method. The response of these artificial systems can be the identity of the odorant, an estimate concentration of the odorant, or characteristic properties of the odour as might be perceived by a human. These electronic noses are bio inspired instruments that mimic the sense of smell. The complexity of most odorants makes characterisation difficult with conventional analysis techniques, such as gas chromatography. Sensory analysis by a panel of experts is a costly process since it requires trained people who can work for only relatively short periods of time. The electronic noses are easy to build, provide short analysis times, in real time and on-line, and show high sensitivity and selectivity to the tested odorants. These systems are non-destructive techniques used to characterise odorants in diverse applications linked with the quality of life such as: control of foods, environmental quality, citizen security or clinical diagnostics. However, there is much research still to be done especially with regard to new materials and sensors technology, data processing, interpretation and validation of results. This work examines the main features of modern electronic noses and their most important applications in the environmental, and security fields. The above mentioned main components of an electronic nose (sample handling system, more advanced materials and methods for sensing, and data processing system) are described. Finally, some interesting remarks concerning the strengths and weaknesses of electronic noses in the different applications are also mentioned.

  2. Advanced Turbine Technology Applications Project (ATTAP)

    NASA Technical Reports Server (NTRS)

    1989-01-01

    ATTAP activities during the past year were highlighted by an extensive materials assessment, execution of a reference powertrain design, test-bed engine design and development, ceramic component design, materials and component characterization, ceramic component process development and fabrication, component rig design and fabrication, test-bed engine fabrication, and hot gasifier rig and engine testing. Materials assessment activities entailed engine environment evaluation of domestically supplied radial gasifier turbine rotors that were available at the conclusion of the Advanced Gas Turbine (AGT) Technology Development Project as well as an extensive survey of both domestic and foreign ceramic suppliers and Government laboratories performing ceramic materials research applicable to advanced heat engines. A reference powertrain design was executed to reflect the selection of the AGT-5 as the ceramic component test-bed engine for the ATTAP. Test-bed engine development activity focused on upgrading the AGT-5 from a 1038 C (1900 F) metal engine to a durable 1371 C (2500 F) structural ceramic component test-bed engine. Ceramic component design activities included the combustor, gasifier turbine static structure, and gasifier turbine rotor. The materials and component characterization efforts have included the testing and evaluation of several candidate ceramic materials and components being developed for use in the ATTAP. Ceramic component process development and fabrication activities were initiated for the gasifier turbine rotor, gasifier turbine vanes, gasifier turbine scroll, extruded regenerator disks, and thermal insulation. Component rig development activities included combustor, hot gasifier, and regenerator rigs. Test-bed engine fabrication activities consisted of the fabrication of an all-new AGT-5 durability test-bed engine and support of all engine test activities through instrumentation/build/repair. Hot gasifier rig and test-bed engine testing

  3. Antireflective surface patterned by rolling mask lithography

    NASA Astrophysics Data System (ADS)

    Seitz, Oliver; Geddes, Joseph B.; Aryal, Mukti; Perez, Joseph; Wassei, Jonathan; McMackin, Ian; Kobrin, Boris

    2014-03-01

    A growing number of commercial products such as displays, solar panels, light emitting diodes (LEDs and OLEDs), automotive and architectural glass are driving demand for glass with high performance surfaces that offer anti-reflective, self-cleaning, and other advanced functions. State-of-the-art coatings do not meet the desired performance characteristics or cannot be applied over large areas in a cost-effective manner. "Rolling Mask Lithography" (RML™) enables highresolution lithographic nano-patterning over large-areas at low-cost and high-throughput. RML is a photolithographic process performed using ultraviolet (UV) illumination transmitted through a soft cylindrical mask as it rolls across a substrate. Subsequent transfer of photoresist patterns into the substrate is achieved using an etching process, which creates a nanostructured surface. The current generation exposure tool is capable of patterning one-meter long substrates with a width of 300 mm. High-throughput and low-cost are achieved using continuous exposure of the resist by the cylindrical photomask. Here, we report on significant improvements in the application of RML™ to fabricate anti-reflective surfaces. Briefly, an optical surface can be made antireflective by "texturing" it with a nano-scale pattern to reduce the discontinuity in the index of refraction between the air and the bulk optical material. An array of cones, similar to the structure of a moth's eye, performs this way. Substrates are patterned using RML™ and etched to produce an array of cones with an aspect ratio of 3:1, which decreases the reflectivity below 0.1%.

  4. Formation of Magnetic Anisotropy by Lithography

    PubMed Central

    Kim, Si Nyeon; Nam, Yoon Jae; Kim, Yang Doo; Choi, Jun Woo; Lee, Heon; Lim, Sang Ho

    2016-01-01

    Artificial interface anisotropy is demonstrated in alternating Co/Pt and Co/Pd stripe patterns, providing a means of forming magnetic anisotropy using lithography. In-plane hysteresis loops measured along two principal directions are explained in depth by two competing shape and interface anisotropies, thus confirming the formation of interface anisotropy at the Co/Pt and Co/Pd interfaces of the stripe patterns. The measured interface anisotropy energies, which are in the range of 0.2–0.3 erg/cm2 for both stripes, are smaller than those observed in conventional multilayers, indicating a decrease in smoothness of the interfaces when formed by lithography. The demonstration of interface anisotropy in the Co/Pt and Co/Pd stripe patterns is of significant practical importance, because this setup makes it possible to form anisotropy using lithography and to modulate its strength by controlling the pattern width. Furthermore, this makes it possible to form more complex interface anisotropy by fabricating two-dimensional patterns. These artificial anisotropies are expected to open up new device applications such as multilevel bits using in-plane magnetoresistive thin-film structures. PMID:27216420

  5. Formation of Magnetic Anisotropy by Lithography.

    PubMed

    Kim, Si Nyeon; Nam, Yoon Jae; Kim, Yang Doo; Choi, Jun Woo; Lee, Heon; Lim, Sang Ho

    2016-01-01

    Artificial interface anisotropy is demonstrated in alternating Co/Pt and Co/Pd stripe patterns, providing a means of forming magnetic anisotropy using lithography. In-plane hysteresis loops measured along two principal directions are explained in depth by two competing shape and interface anisotropies, thus confirming the formation of interface anisotropy at the Co/Pt and Co/Pd interfaces of the stripe patterns. The measured interface anisotropy energies, which are in the range of 0.2-0.3 erg/cm(2) for both stripes, are smaller than those observed in conventional multilayers, indicating a decrease in smoothness of the interfaces when formed by lithography. The demonstration of interface anisotropy in the Co/Pt and Co/Pd stripe patterns is of significant practical importance, because this setup makes it possible to form anisotropy using lithography and to modulate its strength by controlling the pattern width. Furthermore, this makes it possible to form more complex interface anisotropy by fabricating two-dimensional patterns. These artificial anisotropies are expected to open up new device applications such as multilevel bits using in-plane magnetoresistive thin-film structures. PMID:27216420

  6. Self-segregating materials for immersion lithography

    NASA Astrophysics Data System (ADS)

    Sanders, Daniel P.; Sundberg, Linda K.; Brock, Phillip J.; Ito, Hiroshi; Truong, Hoa D.; Allen, Robert D.; McIntyre, Gregory R.; Goldfarb, Dario L.

    2008-03-01

    In this paper, we employ the self-segregating materials approach used in topcoat-free resists for water immersion lithography to extend the performance of topcoat materials for water immersion and to increase the contact angles of organic fluids on topcoat-free resists for high index immersion lithography. By tailoring polymers that segregate to the air and resist interfaces of the topcoat, high contact angle topcoats with relatively low fluorine content are achieved. While graded topcoats may extend the performance and/or reduce the cost of topcoat materials, the large amount of unprotected acidic groups necessary for TMAH development prevent them from achieving the high contact angles and low hysteresis exhibited by topcoat-free resists. Another application of this self-segregating approach is tailoring resist surfaces for high index immersion. Due to the low surface tension and higher viscosities of organic fluids relative to water and their lower contact angles on most surfaces, film pulling cannot be prevented without dramatically reducing wafer scan rates; however, tuning the surface energy of the resist may be important to control stain morphology and facilitate fluid removal from the wafer. By tailoring fluoropolymer additives for high contact angles with second generation organic high index immersion fluids, we show herein that topcoat-free resists can be developed specifically for high index immersion lithography with good contact angles and lithographic imaging performance.

  7. Advanced Turbine Technology Applications Project (ATTAP)

    NASA Technical Reports Server (NTRS)

    1993-01-01

    The Advanced Turbine Technologies Application Project (ATTAP) is in the fifth year of a multiyear development program to bring the automotive gas turbine engine to a state at which industry can make commercialization decisions. Activities during the past year included reference powertrain design updates, test-bed engine design and development, ceramic component design, materials and component characterization, ceramic component process development and fabrication, ceramic component rig testing, and test-bed engine fabrication and testing. Engine design and development included mechanical design, combustion system development, alternate aerodynamic flow testing, and controls development. Design activities included development of the ceramic gasifier turbine static structure, the ceramic gasifier rotor, and the ceramic power turbine rotor. Material characterization efforts included the testing and evaluation of five candidate high temperature ceramic materials. Ceramic component process development and fabrication, with the objective of approaching automotive volumes and costs, continued for the gasifier turbine rotor, gasifier turbine scroll, extruded regenerator disks, and thermal insulation. Engine and rig fabrication, testing, and development supported improvements in ceramic component technology. Total test time in 1992 amounted to 599 hours, of which 147 hours were engine testing and 452 were hot rig testing.

  8. Polymers as advanced materials for desiccant applications

    SciTech Connect

    Czanderna, A.W.

    1990-12-01

    This research is concerned with solid materials used as desiccants for desiccant cooling systems (DCSs) that process water vapor in an atmosphere to produce cooling. Background information includes an introduction to DCSs and the role of the desiccant as a system component. The water vapor sorption performance criteria used for screening the modified polymers prepared include the water sorption capacity from 5% to 80% relative humidity (R.H.), isotherm shape, and rate of adsorption and desorption. Measurements are presented for the sorption performance of modified polymeric advanced desiccant materials with the quartz crystal microbalance. Isotherms of polystyrene sulfonic acid (PSSA) taken over a 5-month period show that the material has a dramatic loss in capacity and that the isotherm shape is time dependent. The adsorption and desorption kinetics for PSSA and all the ionic salts of it studied are easily fast enough for commercial DCS applications with a wheel rotation speed of 6 min per revolution. Future activities for the project are addressed, and a 5-year summary of the project is included as Appendix A. 34 refs., 20 figs., 3 tabs.

  9. Lithography alternatives meet design style reality: How do they "line" up?

    NASA Astrophysics Data System (ADS)

    Smayling, Michael C.

    2016-03-01

    Optical lithography resolution scaling has stalled, giving innovative alternatives a window of opportunity. One important factor that impacts these lithographic approaches is the transition in design style from 2D to 1D for advanced CMOS logic. Just as the transition from 3D circuits to 2D fabrication 50 years ago created an opportunity for a new breed of electronics companies, the transition today presents exciting and challenging time for lithographers. Today, we are looking at a range of non-optical lithography processes. Those considered here can be broadly categorized: self-aligned lithography, self-assembled lithography, deposition lithography, nano-imprint lithography, pixelated e-beam lithography, shot-based e-beam lithography .Do any of these alternatives benefit from or take advantage of 1D layout? Yes, for example SAPD + CL (Self Aligned Pitch Division combined with Complementary Lithography). This is a widely adopted process for CMOS nodes at 22nm and below. Can there be additional design / process co-optimization? In spite of the simple-looking nature of 1D layout, the placement of "cut" in the lines and "holes" for interlayer connections can be tuned for a given process capability. Examples of such optimization have been presented at this conference, typically showing a reduction of at least one in the number of cut or hole patterns needed.[1,2] Can any of the alternatives complement each other or optical lithography? Yes.[3] For example, DSA (Directed Self Assembly) combines optical lithography with self-assembly. CEBL (Complementary e-Beam Lithography) combines optical lithography with SAPD for lines with shot-based e-beam lithography for cuts and holes. Does one (shrinking) size fit all? No, that's why we have many alternatives. For example NIL (Nano-imprint Lithography) has been introduced for NAND Flash patterning where the (trending lower) defectivity is acceptable for the product. Deposition lithography has been introduced in 3D NAND Flash to

  10. Zone-plate-array lithography (ZPL): a maskless fast-turn-around system for microoptic device fabrication

    NASA Astrophysics Data System (ADS)

    Menon, Rajesh; Gil, Dario; Carter, David J. D.; Patel, Amil; Smith, Henry I.

    2003-01-01

    Ever-increasing demands of smaller feature sizes and larger throughputs have catapulted the semicondutor lithography juggernaut to develop immensely complex and expensive systems. However, it is not clear if the lithography needs for microoptic and other "botique" device fabrication are being addressed. ZPAL is a new nanolithography technique which leverages advances in micromechanics and diffractive optics technologies. We present ZPAL as the ideal system for such non-conventional lithography needs.

  11. Nanometer x-ray lithography

    NASA Astrophysics Data System (ADS)

    Hartley, Frank T.; Khan Malek, Chantal G.

    1999-10-01

    New developments for x-ray nanomachining include pattern transfer onto non-planar surfaces coated with electrodeposited resists using synchrotron radiation x-rays through extremely high-resolution mask made by chemically assisted focused ion beam lithography. Standard UV photolithographic processes cannot maintain sub-micron definitions over large variation in feature topography. The ability of x-ray printing to pattern thin or thick layers of photoresist with high resolution on non-planar surfaces of large and complex topographies with limited diffraction and scattering effects and no substrate reflection is known and can be exploited for patterning microsystems with non-planar 3D geometries as well as multisided and multilayered substrates. Thin conformal coatings of electro-deposited positive and negative tone photoresist have been shown to be x-ray sensitive and accommodate sub-micro pattern transfer over surface of extreme topographical variations. Chemically assisted focused ion beam selective anisotropic erosion was used to fabricate x-ray masks directly. Masks with feature sizes less than 20 nm through 7 microns of gold were made on bulk silicon substrates and x-ray mask membranes. The technique is also applicable to other high density materials. Such masks enable the primary and secondary patterning and/or 3D machining of Nano-Electro-Mechanical Systems over large depths or complex relief and the patterning of large surface areas with sub-optically dimensioned features.

  12. Mix-and-match lithography for half-micron technology

    NASA Astrophysics Data System (ADS)

    Flack, Warren W.; Dameron, David H.

    1991-08-01

    Half-micron lithography for a production environment is not considered realistic with currently available lithography tools. While optical steppers have high wafer throughputs, they do not have sufficient process latitude at half-micron geometries. In contrast, advanced technologies with sufficient capabilities for half-micron processing such as direct-write e-beam and x-ray lithography are extremely expensive and have low effective throughputs. A mix-and- match lithography approach can take advantage of the best features of both types of systems by sing an optical stepper for noncritical levels and an advanced lithography system for critical levels. In order to facilitate processing of a triple level metal half-micron CMOS technology, a mix-and-match scheme has been developed between a Hitachi HL-700 D e-beam direct write system and an Ultratech 1500 wide-field 1x stepper. The Hitachi is used to pattern an accurate zero or registration level. All critical levels are exposed on the Hitachi and aligned back to this zero level. The Ultratech is used to align all other process levels which do not have critical targets that are placed on subsequent process levels. The mix-and-match approach is discussed, and optical to e-beam as well as e-beam to optical alignment results from seven production lots are presented. The linear alignment error components X translation, Y translation, rotation and magnification are extracted and analyzed to determine their source. It was found that a simple adjustment improved the registration capabilities of these two lithography tools by reducing the X translation, Y translation and rotation standard deviations by a factor of two or more, while greatly reducing the magnification errors between the two tools.

  13. Extreme ultraviolet lithography machine

    SciTech Connect

    Tichenor, D.A.; Kubiak, G.D.; Haney, S.J.; Sweeney, D.W.

    2000-02-29

    An extreme ultraviolet lithography (EUVL) machine or system is disclosed for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10--14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate. In one embodiment of a EUVL machine, nine optical components are utilized, with four of the optical components located in the PO box. The main or projection chamber includes vibration isolators for the PO box and a vibration isolator mounting for the substrate, with the main or projection chamber being mounted on a support structure and being isolated.

  14. Extreme ultraviolet lithography machine

    DOEpatents

    Tichenor, Daniel A.; Kubiak, Glenn D.; Haney, Steven J.; Sweeney, Donald W.

    2000-01-01

    An extreme ultraviolet lithography (EUVL) machine or system for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10-14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate. In one embodiment of a EUVL machine, nine optical components are utilized, with four of the optical components located in the PO box. The main or projection chamber includes vibration isolators for the PO box and a vibration isolator mounting for the substrate, with the main or projection chamber being mounted on a support structure and being isolated.

  15. Advanced Turbine Technology Applications Project (ATTAP)

    NASA Technical Reports Server (NTRS)

    1990-01-01

    Advanced Turbine Technology Application Project (ATTAP) activities during the past year were highlighted by test-bed engine design and development activities; ceramic component design; materials and component characterization; ceramic component process development and fabrication; component rig testing; and test-bed engine fabrication and testing. Although substantial technical challenges remain, all areas exhibited progress. Test-bed engine design and development activity included engine mechanical design, power turbine flow-path design and mechanical layout, and engine system integration aimed at upgrading the AGT-5 from a 1038 C metal engine to a durable 1371 C structural ceramic component test-bed engine. ATTAP-defined ceramic and associated ceramic/metal component design activities include: the ceramic combustor body, the ceramic gasifier turbine static structure, the ceramic gasifier turbine rotor, the ceramic/metal power turbine static structure, and the ceramic power turbine rotors. The materials and component characterization efforts included the testing and evaluation of several candidate ceramic materials and components being developed for use in the ATTAP. Ceramic component process development and fabrication activities are being conducted for the gasifier turbine rotor, gasifier turbine vanes, gasifier turbine scroll, extruded regenerator disks, and thermal insulation. Component rig testing activities include the development of the necessary test procedures and conduction of rig testing of the ceramic components and assemblies. Four-hundred hours of hot gasifier rig test time were accumulated with turbine inlet temperatures exceeding 1204 C at 100 percent design gasifier speed. A total of 348.6 test hours were achieved on a single ceramic rotor without failure and a second ceramic rotor was retired in engine-ready condition at 364.9 test hours. Test-bed engine fabrication, testing, and development supported improvements in ceramic component technology

  16. Advances in LEDs for automotive applications

    NASA Astrophysics Data System (ADS)

    Bhardwaj, Jy; Peddada, Rao; Spinger, Benno

    2016-03-01

    High power LEDs were introduced in automotive headlights in 2006-2007, for example as full LED headlights in the Audi R8 or low beam in Lexus. Since then, LED headlighting has become established in premium and volume automotive segments and beginning to enable new compact form factors such as distributed low beam and new functions such as adaptive driving beam. New generations of highly versatile high power LEDs are emerging to meet these application needs. In this paper, we will detail ongoing advances in LED technology that enable revolutionary styling, performance and adaptive control in automotive headlights. As the standards which govern the necessary lumens on the road are well established, increasing luminance enables not only more design freedom but also headlight cost reduction with space and weight saving through more compact optics. Adaptive headlighting is based on LED pixelation and requires high contrast, high luminance, smaller LEDs with high-packing density for pixelated Matrix Lighting sources. Matrix applications require an extremely tight tolerance on not only the X, Y placement accuracy, but also on the Z height of the LEDs given the precision optics used to image the LEDs onto the road. A new generation of chip scale packaged (CSP) LEDs based on Wafer Level Packaging (WLP) have been developed to meet these needs, offering a form factor less than 20% increase over the LED emitter surface footprint. These miniature LEDs are surface mount devices compatible with automated tools for L2 board direct attach (without the need for an interposer or L1 substrate), meeting the high position accuracy as well as the optical and thermal performance. To illustrate the versatility of the CSP LEDs, we will show the results of, firstly, a reflector-based distributed low beam using multiple individual cavities each with only 20mm height and secondly 3x4 to 3x28 Matrix arrays for adaptive full beam. Also a few key trends in rear lighting and impact on LED light

  17. Large area gold coated nano-needles fabricated by proximity mask aligner lithography for plasmonic AR-structures

    NASA Astrophysics Data System (ADS)

    Bourgin, Yannick; Michaelis, Dirk; Käsebier, Thomas; Dannberg, Peter; Zeitner, Uwe D.

    2016-04-01

    Mask-aligner (MA) lithography is a well-known method for the fabrication of micrometer sized structures on a substrate with a diameter up to 300 mm. In spite of a theoretical resolution below 200 nm, the minimum printable feature sized remained above 1μm due to diffraction effects and limit its utilization to advanced packaging, or MEMS fabrication. Recently, developments in the illumination system and mechanical parts (known as AMALTIH for Advanced MA LITHography) as well as mask design, have permitted to used diffractive based photo-mask, and then reach the resolution limit mentioned above. This opens the possibility to fabricate smaller structures, usually accessible only by ebeam lithography. We propose here to demonstrate a fast and robust fabrication method of large area plasmonic absorber structures based on 2D sub-micrometric (350 nm period) nano-needles in a transparent polymer on a glass substrate and coated with a 50 nm thick gold layer. The interaction of the incoming light with metallic structured surface leads to the small total reflections of the 0th order below 5 %, over a large spectral band (460-660 nm) and a large set of incidence angles with TE and TM polarizations. Those results demonstrate that our fabrication process is a step toward the implementation of plasmonic based effect structures for a wide range of application.

  18. Advanced technologies for remote sensing imaging applications

    SciTech Connect

    Wood, L.L.

    1993-06-07

    Generating and returning imagery from great distances has been generally associated with national security activities, with emphasis on reliability of system operation. (While the introduction of such capabilities was usually characterized by high levels of innovation, the evolution of such systems has followed the classical track of proliferation of ``standardized items`` expressing ever more incremental technological advances.) Recent focusing of interest on the use of remote imaging systems for commercial and scientific purposes can be expected to induce comparatively rapid advances along the axes of efficiency and technological sophistication, respectively. This paper reviews the most basic reasons for expecting the next decade of advances to dwarf the impressive accomplishments of the past ten years. The impact of these advances clearly will be felt in all major areas of large-scale human endeavor, commercial, military and scientific.

  19. Photoinhibition superresolution lithography

    NASA Astrophysics Data System (ADS)

    Forman, Darren Lawrence

    While the prospect of nanoscale manufacturing has generated tremendous excitement, arbitrary patterning at nanometer length scales cannot be brought about with current photolithography---the technology that for decades has driven electronics miniaturization and enabled mass production of digital logic, memory, MEMS and flat-panel displays. This is due to the relatively long wavelength of light and diffraction, which imposes a physical not technological limit on the resolution of a far-field optical pattern. Photoinhibited superresolution (PInSR) lithography is a new scheme designed to beat the diffraction limit through two-color confinement of photopolymerization and, via efficient single-photon absorption kinetics, also be high-throughput capable. This thesis describes development of an integrated optical and materials system for investigating spatiotemporal dynamics of photoinhibited superresolution lithography, with a demonstrated 3x superresolution beyond the diffraction limit. The two-color response, arising from orthogonal photogeneration of species that participate in competing reactions, is shown to be highly complex. This is both a direct and indirect consequence of mobility. Interesting trade-offs arise: thin-film resins (necessitated by single-photon absorption kinetics) require high viscosity for film stability, but the photoinhibition effect is suppressed in viscous resins. Despite this apparent suppression, which can be overcome with high excitation of the photoinhibition system, the low mobility afforded by viscous materials is beneficial for confinement of active species. Diffusion-induced blurring of patterned photoinhibition is problematic in a resin with viscosity = 1,000 cP, and overcome in a resin with viscosity eta = 500,000 cP. Superresolution of factor 3x beyond the diffraction limit is demonstrated at 0.2 NA, with additional results indicating superresolution ability at 1.2 NA. Investigating the effect of diminished photoinhibition efficacy

  20. Nanoimprint lithography: an enabling technology for nanophotonics

    NASA Astrophysics Data System (ADS)

    Yao, Yuhan; Liu, He; Wang, Yifei; Li, Yuanrui; Song, Boxiang; Bratkovsk, Alexandre; Wang, Shih-Yuan; Wu, Wei

    2015-11-01

    Nanoimprint lithography (NIL) is an indispensable tool to realize a fast and accurate nanoscale patterning in nanophotonics due to high resolution and high yield. The number of publication on NIL has increased from less than a hundred per year to over three thousand per year. In this paper, the most recent developments on NIL patterning transfer processes and its applications on nanophotonics are discussed and reviewed. NIL has been opening up new opportunities for nanophotonics, especially in fabricating optical meta-materials. With more researches on this low-cost high-throughput fabrication technology, we should anticipate a brighter future for nanophotonics and NIL.

  1. Physical Limitations in Lithography for Microelectronics.

    ERIC Educational Resources Information Center

    Flavin, P. G.

    1981-01-01

    Describes techniques being used in the production of microelectronics kits which have replaced traditional optical lithography, including contact and optical projection printing, and X-ray and electron beam lithography. Also includes limitations of each technique described. (SK)

  2. Polymer nanofibers by soft lithography

    NASA Astrophysics Data System (ADS)

    Pisignano, Dario; Maruccio, Giuseppe; Mele, Elisa; Persano, Luana; Di Benedetto, Francesca; Cingolani, Roberto

    2005-09-01

    The fabrication of polymeric fibers by soft lithography is demonstrated. Polyurethane, patterned by capillarity-induced molding with high-resolution elastomeric templates, forms mm-long fibers with a diameter below 0.3μm. The Young's modulus of the fabricated structures, evaluated by force-distance scanning probe spectroscopy, has a value of 0.8MPa. This is an excellent example of nanostructures feasible by the combination of soft nanopatterning and high-resolution fabrication approaches for master templates, and particularly electron-beam lithography.

  3. Recent progress in nanoparticle photoresists development for EUV lithography

    NASA Astrophysics Data System (ADS)

    Kasahara, Kazuki; Kosma, Vasiliki; Odent, Jeremy; Xu, Hong; Yu, Mufei; Giannelis, Emmanuel P.; Ober, Christopher K.

    2016-03-01

    Extreme ultraviolet (EUV) lithography is a promising candidate for next generation lithography. For high volume manufacturing of semiconductor devices, significant improvement of resolution and sensitivity is required for successful implementation of EUV resists. Performance requirements for such resists demand the development of entirely new resist platforms. Cornell University has intensely studied metal oxide nanoparticle photoresists with high sensitivity for EUV lithography applications. Zirconium oxide nanoparticles with PAG enabling sub 30nm line negative tone patterns at an EUV dose below 5 mJ/cm2 show one of the best EUV sensitivity results ever reported. In this paper, recent progress in metal oxide nanoparticle photoresist research will be discussed. Several studies regarding composition investigation and new metal element study are reported.

  4. Optical Multiple Access Network (OMAN) for advanced processing satellite applications

    NASA Technical Reports Server (NTRS)

    Mendez, Antonio J.; Gagliardi, Robert M.; Park, Eugene; Ivancic, William D.; Sherman, Bradley D.

    1991-01-01

    An OMAN breadboard for exploring advanced processing satellite circuit switch applications is introduced. Network architecture, hardware trade offs, and multiple user interference issues are presented. The breadboard test set up and experimental results are discussed.

  5. Reliability and qualification of advanced microelectronics for space applications

    NASA Technical Reports Server (NTRS)

    Kayali, S.

    2003-01-01

    This paper provides a discussion of the subject and an approach to establish a reliability and qualification methodology to facilitate the utilization of state-of-the-art advanced microelectronic devices and structures in high reliability applications.

  6. Agricultural and environmental applications of biochar: Advances and barriers

    Technology Transfer Automated Retrieval System (TEKTRAN)

    This summary chapter highlights the achieved advances in biochar research and the existing barriers to biochar application. Substantial research over the past decade on biochar production, characterization, and utilization has indicated that biochar serves as a promising agricultural and environment...

  7. Advanced remote handling for future applications: The advanced integrated maintenance system

    SciTech Connect

    Herndon, J.N.; Kring, C.T.; Rowe, J.C.

    1986-01-01

    The Consolidated Fuel Reprocessing Program at Oak Ridge National Laboratory has been developing advanced techniques for remote maintenance of future US fuel reprocessing plants. The developed technology has a wide spectrum of application for other hazardous environments. These efforts are based on the application of teleoperated, force-reflecting servomanipulators for dexterous remote handling with television viewing for large-volume hazardous applications. These developments fully address the nonrepetitive nature of remote maintenance in the unstructured environments encountered in fuel reprocessing. This paper covers the primary emphasis in the present program; the design, fabrication, installation, and operation of a prototype remote handling system for reprocessing applications, the Advanced Integrated Maintenance System.

  8. Introduction to Natural Resources: Advanced Applications.

    ERIC Educational Resources Information Center

    Crummett, Dan

    This guide, which is designed for use with student and teacher guides to a 10-unit secondary-level course in natural resources, contains a series of student supplements and advanced assignment and job sheets that provide students with additional opportunities to explore the following areas of natural resources and conservation education: outdoor…

  9. Advanced transponders for deep space applications

    NASA Technical Reports Server (NTRS)

    Nguyen, Tien M.; Kayalar, Selahattin; Yeh, Hen-Geul; Kyriacou, Charles

    1993-01-01

    Three architectures for advanced deep space transponders are proposed. The architectures possess various digital techniques such as fast Fourier transform (FFT), digital phase-locked loop (PLL), and digital sideband aided carrier detection with analog or digital turn-around ranging. Preliminary results on the design and conceptual implementation are presented. Modifications to the command detector unit (CDU) are also presented.

  10. Microfabrication using soft lithography

    NASA Astrophysics Data System (ADS)

    Zhao, Xiao-Mei

    Soft Lithography is a group of non-photolithographic techniques currently being explored in our group. Four such techniques-microcontact printing (μCP), replica molding (REM), micromolding in capillaries (MIMIC), and microtransfer molding (μTM)-have been demonstrated for fabricating micro- and nanostructures of a variety of materials with dimension >=30 nm. Part I (Chapters 1-5) reviews several aspects of the three molding techniques REM, MIMIC, and μTM. Chapters 1-3 describe μTM and MIMIC, and the use of these techniques in the fabrication of functional devices. μTM is capable of generating μm-scale structures over large areas, on both planar and contoured surfaces, and is able to make 3-dimensional structures layer by layer. The capability of μTM and MIMIC has been demonstrated in the fabrication of single-mode waveguides, waveguide couplers and interferometers. The coupling between waveguides can be tailored by waveguide spacing or the differential in curing time between the waveguides and the cladding. Chapters 4-5 demonstrate the combination of REM and shrinkable polystyrene (PS) films to reduce the feature size of microstructures and to generate microstructures with high aspect ratios on both planar and curved surfaces. A shrinkable PS film is patterned with relief structures, and then heated and shrinks. Thermal shrinkage results in a 100-fold increase in the aspect ratio of the patterned microstructures in the PS film. The microstructures in the shrunken PS films can be transferred to many other materials by REM. Part II (Chapters 6-7) focuses on two issues in the microfabrication using self-assembled monolayers (SAMs) as ultrathin resists. Chapter 6 describes a selective etching solution for transferring patterns of SAMs of alkanethiolates into the underlying layers (e.g., gold, silver, and copper). This etching solution uses thiosulfate as the ligand that coordinates to the metal ions, and ferricyanide as the oxidant. It has been demonstrated to be

  11. Advanced composite applications for sub-micron biologically derived microstructures

    NASA Technical Reports Server (NTRS)

    Schnur, J. M.; Price, R. R.; Schoen, P. E.; Bonanventura, Joseph; Kirkpatrick, Douglas

    1991-01-01

    A major thrust of advanced material development is in the area of self-assembled ultra-fine particulate based composites (micro-composites). The application of biologically derived, self-assembled microstructures to form advanced composite materials is discussed. Hollow 0.5 micron diameter cylindrical shaped microcylinders self-assemble from diacetylenic lipids. These microstructures have a multiplicity of potential applications in the material sciences. Exploratory development is proceeding in application areas such as controlled release for drug delivery, wound repair, and biofouling as well as composites for electronic and magnetic applications, and high power microwave cathodes.

  12. DSA via hole shrink for advanced node applications

    NASA Astrophysics Data System (ADS)

    Chi, Cheng; Liu, Chi-Chun; Meli, Luciana; Schmidt, Kristin; Xu, Yongan; DeSilva, Ekmini Anuja; Sanchez, Martha; Farrell, Richard; Cottle, Hongyun; Kawamura, Daiji; Singh, Lovejeet; Furukawa, Tsuyoshi; Lai, Kafai; Pitera, Jed W.; Sanders, Daniel; Hetzer, David R.; Metz, Andrew; Felix, Nelson; Arnold, John; Colburn, Matthew

    2016-04-01

    Directed self-assembly (DSA) of block copolymers (BCPs) has become a promising patterning technique for 7nm node hole shrink process due to its material-controlled CD uniformity and process simplicity.[1] For such application, cylinder-forming BCP system has been extensively investigated compared to its counterpart, lamella-forming system, mainly because cylindrical BCPs will form multiple vias in non-circular guiding patterns (GPs), which is considered to be closer to technological needs.[2-5] This technological need to generate multiple DSA domains in a bar-shape GP originated from the resolution limit of lithography, i.e. those vias placed too close to each other will merge and short the circuit. In practice, multiple patterning and self-aligned via (SAV) processes have been implemented in semiconductor manufacturing to address this resolution issue.[6] The former approach separates one pattern layer with unresolvable dense features into several layers with resolvable features, while the latter approach simply utilizes the superposition of via bars and the pre-defined metal trench patterns in a thin hard mask layer to resolve individual vias, as illustrated in Fig 1 (upper). With proper design, using DSA to generate via bars with the SAV process could provide another approach to address the resolution issue.

  13. Graphic Arts/Offset Lithography.

    ERIC Educational Resources Information Center

    Hoisington, James; Metcalf, Joseph

    This revised curriculum for graphic arts is designed to provide secondary and postsecondary students with entry-level skills and an understanding of current printing technology. It contains lesson plans based on entry-level competencies for offset lithography as identified by educators and industry representatives. The guide is divided into 15…

  14. Biomolecular Patterning via Photocatalytic Lithography

    SciTech Connect

    Bearinger, J P; Hiddessen, A L; Wu, K J; Christian, A T; Dugan, L C; Stone, G; Camarero, J; Hinz, A K; Hubbell, J A

    2005-02-18

    We have developed a novel method for patterning surface chemistry: Photocatalytic Lithography. This technique relies on inexpensive stamp materials and light; it does not necessitate mass transport or specified substrates, and the wavelength of light should not limit feature resolution. We have demonstrated the utility of this technique through the patterning of proteins, single cells and bacteria.

  15. Monitoring acidic and basic molecular contamination in leading edge lithography and metrology applications: quantitative comparison of solid state and impinger-based sampling methods

    NASA Astrophysics Data System (ADS)

    Riddle Vogt, Sarah; Landoni, Cristian

    2010-03-01

    Assessing molecular contamination (MC) at part-per-billion (ppbV) or part-per-trillion volume (pptV) levels in cleanroom air and purge gas lines is essential to protect lithography and metrology tools optics and components. Current lithography and metrology tool manufacturer's specifications require testing of some contaminants down to single digit pptV levels. Ideally this analysis would be performed with an on-line analyzer (capable of providing almost instant results): the best analyzers currently available are only capable of providing 100 pptV detection. Liquid impinger sampling has been the dominant sample collection method for sub ppbV acidic and basic MC analysis. Impinger sampling suffers from some inherent problems that can dramatically reduce the collection efficiency such as analyte solubility and evaporative losses. An innovative solid-state trapping technology has been recently developed by SAES Pure Gas along with the CollectTorr sampling system. NIST traceable gas phase standards have been used to compare the collection efficiency of the traditional impinger technology to that of the solid state trapping method. Results varied greatly for the different acid gases with sulfur dioxide showing comparable collection efficiencies while hydrofluoric acid and hydrochloric acid showed much lower recoveries in the impingers than the solid-state traps. Ammonia collection efficiencies were slightly higher for the solid state traps and were improved in the impingers when an acidified solution was used as the collection media. The use of solid-state traps, besides being much simpler from both the handling and logistical stand point, eliminates the analyte solubility and evaporation problems frequently seen with the impinger sampling.

  16. Mechanochemical synthesis of advanced nanomaterials for catalytic applications.

    PubMed

    Xu, Chunping; De, Sudipta; Balu, Alina M; Ojeda, Manuel; Luque, Rafael

    2015-04-21

    Mechanochemical synthesis emerged as the most advantageous, environmentally sound alternative to traditional routes for nanomaterials preparation with outstanding properties for advanced applications. Featuring simplicity, high reproducibility, mild/short reaction conditions and often solvent-free condition (dry milling), mechanochemistry can offer remarkable possibilities in the development of advanced catalytically active materials. The proposed contribution has been aimed to provide a brief account of remarkable recent findings and advances in the mechanochemical synthesis of solid phase advanced catalysts as opposed to conventional systems. The role of mechanical energy in the synthesis of solid catalysts and their application is critically discussed as well as the influence of the synthesis procedure on the physicochemical properties and the efficiency of synthesized catalysts is studied. The main purpose of this feature article is to highlight the possibilities of mechanochemical protocols in (nano)materials engineering for catalytic applications.

  17. Advanced composites: Design and application. Proceedings of the meeting of the Mechanical Failures Prevention Group

    NASA Technical Reports Server (NTRS)

    Shives, T. R.; Willard, W. A.

    1979-01-01

    The design and application of advanced composites is discussed with emphasis on aerospace, aircraft, automotive, marine, and industrial applications. Failure modes in advanced composites are also discussed.

  18. Two new types of microneedle array fabricated by x-ray lithography

    NASA Astrophysics Data System (ADS)

    Li, Yigui; Sugiyama, Susumu

    2004-12-01

    The microneedle for blood extraction and painless injection is a rapidly growing area of interest in bio-applications. Two new types of microneedle array are designed and developed for biomedical application. The one is hollow PMMA microneedle array with very shape tip fabricated by two times X-ray lithography (one time is with X-ray mask and one time is without X-ray mask). The other is PMMA microneedle array with tips and fluid channels fabricated by an X-ray lithography technique. The resist stage of the X-ray system driven by actuators is to realize movement lithography.

  19. A physical resist shrinkage model for full-chip lithography simulations

    NASA Astrophysics Data System (ADS)

    Liu, Peng; Zheng, Leiwu; Ma, Maggie; Zhao, Qian; Fan, Yongfa; Zhang, Qiang; Feng, Mu; Guo, Xin; Wallow, Tom; Gronlund, Keith; Goossens, Ronald; Zhang, Gary; Lu, Yenwen

    2016-03-01

    Strong resist shrinkage effects have been widely observed in resist profiles after negative tone development (NTD) and therefore must be taken into account in computational lithography applications. However, existing lithography simulation tools, especially those designed for full-chip applications, lack resist shrinkage modeling capabilities because they are not needed until only recently when NTD processes begin to replace the conventional positive tone development (PTD) processes where resist shrinkage effects are negligible. In this work we describe the development of a physical resist shrinkage (PRS) model for full-chip lithography simulations and present its accuracy evaluation against experimental data.

  20. Advanced Sensors and Applications Study (ASAS)

    NASA Technical Reports Server (NTRS)

    Chism, S. B.; Hughes, C. L.

    1976-01-01

    The present EOD requirements for sensors in the space shuttle era are reported with emphasis on those applications which were deemed important enough to warrant separate sections. The application areas developed are: (1) agriculture; (2) atmospheric corrections; (3) cartography; (4) coastal studies; (5) forestry; (6) geology; (7) hydrology; (8) land use; (9) oceanography; and (10) soil moisture. For each application area. The following aspects were covered: (1) specific goals and techniques, (2) individual sensor requirements including types, bands, resolution, etc.; (3) definition of mission requirements, type orbits, coverages, etc.; and (4) discussion of anticipated problem areas and solutions. The remote sensors required for these application areas include; (1) camera systems; (2) multispectral scanners; (3) microwave scatterometers; (4) synthetic aperture radars; (5) microwave radiometers; and (6) vidicons. The emphasis in the remote sensor area was on the evaluation of present technology implications about future systems.

  1. Advanced materials for aircraft engine applications.

    PubMed

    Backman, D G; Williams, J C

    1992-02-28

    A review of advances for aircraft engine structural materials and processes is presented. Improved materials, such as superalloys, and the processes for making turbine disks and blades have had a major impact on the capability of modern gas turbine engines. New structural materials, notably composites and intermetallic materials, are emerging that will eventually further enhance engine performance, reduce engine weight, and thereby enable new aircraft systems. In the future, successful aerospace manufacturers will combine product design and materials excellence with improved manufacturing methods to increase production efficiency, enhance product quality, and decrease the engine development cycle time.

  2. Advanced miniature processing handware for ATR applications

    NASA Technical Reports Server (NTRS)

    Chao, Tien-Hsin (Inventor); Daud, Taher (Inventor); Thakoor, Anikumar (Inventor)

    2003-01-01

    A Hybrid Optoelectronic Neural Object Recognition System (HONORS), is disclosed, comprising two major building blocks: (1) an advanced grayscale optical correlator (OC) and (2) a massively parallel three-dimensional neural-processor. The optical correlator, with its inherent advantages in parallel processing and shift invariance, is used for target of interest (TOI) detection and segmentation. The three-dimensional neural-processor, with its robust neural learning capability, is used for target classification and identification. The hybrid optoelectronic neural object recognition system, with its powerful combination of optical processing and neural networks, enables real-time, large frame, automatic target recognition (ATR).

  3. Advanced materials for aircraft engine applications.

    PubMed

    Backman, D G; Williams, J C

    1992-02-28

    A review of advances for aircraft engine structural materials and processes is presented. Improved materials, such as superalloys, and the processes for making turbine disks and blades have had a major impact on the capability of modern gas turbine engines. New structural materials, notably composites and intermetallic materials, are emerging that will eventually further enhance engine performance, reduce engine weight, and thereby enable new aircraft systems. In the future, successful aerospace manufacturers will combine product design and materials excellence with improved manufacturing methods to increase production efficiency, enhance product quality, and decrease the engine development cycle time. PMID:17817782

  4. Technology of alignment mark in electron beam lithography

    NASA Astrophysics Data System (ADS)

    Zhao, Min; Xu, Tang; Chen, Baoqin; Niu, Jiebin

    2014-08-01

    Electron beam direct wring lithography has been an indispensable approach by which all sorts of novel nano-scale devices include many kinds optical devices can be fabricated. Alignment accuracy is a key factor especially to those devices which need multi-level lithography. In addition to electron beam lithography system itself the quality of alignment mark directly influences alignment accuracy. This paper introduces fundamental of alignment mark detection and discusses some techniques of alignment mark fabrication along with considerations for obtaining highly accurate alignment taking JBX5000LS and JBX6300FS e-beam lithography systems for example. The fundamental of alignment mark detection is expounded first. Many kinds of factors which can impact on the quality of alignment mark are analyzed including mark materials, depth of mark groove and influence of multi-channel process. It has been proved from experiments that material used as metal mark with higher average atomic number is better beneficial for getting high alignment accuracy. Depth of mark groove is required to 1.5~5 μm on our experience. The more process steps alignment mark must pass through, the more probability of being damaged there will be. So the compatibility of alignment mark fabrication with the whole device process and the protection of alignment mark are both need to be considered in advance.

  5. Confocal and Two-Photon Microscopy: Foundations, Applications and Advances

    NASA Astrophysics Data System (ADS)

    Diaspro, Alberto

    2001-11-01

    Confocal and Two-Photon Microscopy Foundations, Applications, and Advances Edited by Alberto Diaspro Confocal and two-photon fluorescence microscopy has provided researchers with unique possibilities of three-dimensional imaging of biological cells and tissues and of other structures such as semiconductor integrated circuits. Confocal and Two-Photon Microscopy: Foundations, Applications, and Advances provides clear, comprehensive coverage of basic foundations, modern applications, and groundbreaking new research developments made in this important area of microscopy. Opening with a foreword by G. J. Brakenhoff, this reference gathers the work of an international group of renowned experts in chapters that are logically divided into balanced sections covering theory, techniques, applications, and advances, featuring: In-depth discussion of applications for biology, medicine, physics, engineering, and chemistry, including industrial applications Guidance on new and emerging imaging technology, developmental trends, and fluorescent molecules Uniform organization and review-style presentation of chapters, with an introduction, historical overview, methodology, practical tips, applications, future directions, chapter summary, and bibliographical references Companion FTP site with full-color photographs The significant experience of pioneers, leaders, and emerging scientists in the field of confocal and two-photon excitation microscopy Confocal and Two-Photon Microscopy: Foundations, Applications, and Advances is invaluable to researchers in the biological sciences, tissue and cellular engineering, biophysics, bioengineering, physics of matter, and medicine, who use these techniques or are involved in developing new commercial instruments.

  6. Ceramic applications in the advanced Stirling automotive engine

    NASA Technical Reports Server (NTRS)

    Tomazic, W. A.; Cairelli, J. E.

    1977-01-01

    The ideal cycle, its application to a practical machine, and the specific advantages of high efficiency, low emissions, multi-fuel capability, and low noise of the stirling engine are discussed. Certain portions of the Stirling engine must operate continuously at high temperature. Ceramics offer the potential of cost reduction and efficiency improvement for advanced engine applications. Potential applications for ceramics in Stirling engines, and some of the special problems pertinent to using ceramics in the Stirling engine are described. The research and technology program in ceramics which is planned to support the development of advanced Stirling engines is outlined.

  7. Protein Dielectrophoresis: Advances, Challenges and Applications

    PubMed Central

    Nakano, Asuka; Ros, Alexandra

    2013-01-01

    Protein dielectrophoresis (DEP) has the potential to play an important role as a manipulation, fractionation, pre-concentration and separation method in bioanalysis and as manipulation tool for nanotechnological applications. The first demonstrations of protein DEP have been reported almost twenty years ago. Since then various experimental realizations to manipulate proteins by DEP as well as more targeted applications employing protein DEP have been demonstrated. This review summarizes the experimental studies in the field of protein DEP trapping and focusing as well as specific applications in separation, molecular patterning, on bioprobes and biosensors. While a comprehensive theoretical model describing protein DEP is still lacking we also attempt to provide an overview of the factors influencing protein DEP and relate to currently available theoretical models. We further point out the variations in experimental conditions used in the past to study the somewhat 20 proteins as well as the implications of protein molecular structure to the DEP response. PMID:23400789

  8. Advanced communications payload for mobile applications

    NASA Technical Reports Server (NTRS)

    Ames, S. A.; Kwan, R. K.

    1990-01-01

    An advanced satellite payload is proposed for single hop linking of mobile terminals of all classes as well as Very Small Aperture Terminal's (VSAT's). It relies on an intensive use of communications on-board processing and beam hopping for efficient link design to maximize capacity and a large satellite antenna aperture and high satellite transmitter power to minimize the cost of the ground terminals. Intersatellite links are used to improve the link quality and for high capacity relay. Power budgets are presented for links between the satellite and mobile, VSAT, and hub terminals. Defeating the effects of shadowing and fading requires the use of differentially coherent demodulation, concatenated forward error correction coding, and interleaving, all on a single link basis.

  9. Next generation sequencing technology: Advances and applications.

    PubMed

    Buermans, H P J; den Dunnen, J T

    2014-10-01

    Impressive progress has been made in the field of Next Generation Sequencing (NGS). Through advancements in the fields of molecular biology and technical engineering, parallelization of the sequencing reaction has profoundly increased the total number of produced sequence reads per run. Current sequencing platforms allow for a previously unprecedented view into complex mixtures of RNA and DNA samples. NGS is currently evolving into a molecular microscope finding its way into virtually every fields of biomedical research. In this chapter we review the technical background of the different commercially available NGS platforms with respect to template generation and the sequencing reaction and take a small step towards what the upcoming NGS technologies will bring. We close with an overview of different implementations of NGS into biomedical research. This article is part of a Special Issue entitled: From Genome to Function.

  10. Advanced Turbine Technology Applications Project (ATTAP)

    NASA Technical Reports Server (NTRS)

    1991-01-01

    This report summarizes work performed in support of the development and demonstration of a structural ceramic technology for automotive gas turbine engines. The AGT101 regenerated gas turbine engine developed under the previous DOE/NASA Advanced Gas Turbine (AGT) program is being utilized for verification testing of the durability of next-generation ceramic components and their suitability for service at reference powertrain design conditions. Topics covered in this report include ceramic processing definition and refinement, design improvements to the test bed engine and test rigs, and design methodologies related to ceramic impact and fracture mechanisms. Appendices include reports by ATTAP subcontractors addressing the development of silicon nitride and silicon carbide families of materials and processes.

  11. Applications technology satellites advanced mission study

    NASA Technical Reports Server (NTRS)

    Gould, L. M.

    1972-01-01

    Three spacecraft configurations were designed for operation as a high powered synchronous communications satellite. Each spacecraft includes a 1 kw TWT and a 2 kw Klystron power amplifier feeding an antenna with multiple shaped beams. One of the spacecraft is designed to be boosted by a Thor-Delta launch vehicle and raised to synchronous orbit with electric propulsion. The other two are inserted into a elliptical transfer orbit with an Atlas Centaur and injected into final orbit with an apogee kick motor. Advanced technologies employed in the several configurations include tubes with multiple stage collectors radiating directly to space, multiple-contoured beam antennas, high voltage rollout solar cell arrays with integral power conditioning, electric propulsion for orbit raising and on-station attitude control and station-keeping, and liquid metal slip rings.

  12. Advances in laser diodes for pyrotechnic applications

    NASA Technical Reports Server (NTRS)

    Craig, Richard R.

    1993-01-01

    Background information concerning the use of laser diodes in pyrotechnic applications is provided in viewgraph form. The following topics are discussed: damage limits, temperature stability, fiber coupling issues, and small (100 micron) and large (400 micron) fiber results. The discussions concerning fiber results concentrate on the areas of package geometry and electro-optical properties.

  13. High power infrared QCLs: advances and applications

    NASA Astrophysics Data System (ADS)

    Patel, C. Kumar N.

    2012-01-01

    QCLs are becoming the most important sources of laser radiation in the midwave infrared (MWIR) and longwave infrared (LWIR) regions because of their size, weight, power and reliability advantages over other laser sources in the same spectral regions. The availability of multiwatt RT operation QCLs from 3.5 μm to >16 μm with wall plug efficiency of 10% or higher is hastening the replacement of traditional sources such as OPOs and OPSELs in many applications. QCLs can replace CO2 lasers in many low power applications. Of the two leading groups in improvements in QCL performance, Pranalytica is the commercial organization that has been supplying the highest performance QCLs to various customers for over four year. Using a new QCL design concept, the non-resonant extraction [1], we have achieved CW/RT power of >4.7 W and WPE of >17% in the 4.4 μm - 5.0 μm region. In the LWIR region, we have recently demonstrated QCLs with CW/RT power exceeding 1 W with WPE of nearly 10 % in the 7.0 μm-10.0 μm region. In general, the high power CW/RT operation requires use of TECs to maintain QCLs at appropriate operating temperatures. However, TECs consume additional electrical power, which is not desirable for handheld, battery-operated applications, where system power conversion efficiency is more important than just the QCL chip level power conversion efficiency. In high duty cycle pulsed (quasi-CW) mode, the QCLs can be operated without TECs and have produced nearly the same average power as that available in CW mode with TECs. Multiwatt average powers are obtained even in ambient T>70°C, with true efficiency of electrical power-to-optical power conversion being above 10%. Because of the availability of QCLs with multiwatt power outputs and wavelength range covering a spectral region from ~3.5 μm to >16 μm, the QCLs have found instantaneous acceptance for insertion into multitude of defense and homeland security applications, including laser sources for infrared

  14. MEMS temperature scanner: principles, advances, and applications

    NASA Astrophysics Data System (ADS)

    Otto, Thomas; Saupe, Ray; Stock, Volker; Gessner, Thomas

    2010-02-01

    Contactless measurement of temperatures has gained enormous significance in many application fields, ranging from climate protection over quality control to object recognition in public places or military objects. Thereby measurement of linear or spatially temperature distribution is often necessary. For this purposes mostly thermographic cameras or motor driven temperature scanners are used today. Both are relatively expensive and the motor drive devices are limited regarding to the scanning rate additionally. An economic alternative are temperature scanner devices based on micro mirrors. The micro mirror, attached in a simple optical setup, reflects the emitted radiation from the observed heat onto an adapted detector. A line scan of the target object is obtained by periodic deflection of the micro scanner. Planar temperature distribution will be achieved by perpendicularly moving the target object or the scanner device. Using Planck radiation law the temperature of the object is calculated. The device can be adapted to different temperature ranges and resolution by using different detectors - cooled or uncooled - and parameterized scanner parameters. With the basic configuration 40 spatially distributed measuring points can be determined with temperatures in a range from 350°C - 1000°C. The achieved miniaturization of such scanners permits the employment in complex plants with high building density or in direct proximity to the measuring point. The price advantage enables a lot of applications, especially new application in the low-price market segment This paper shows principle, setup and application of a temperature measurement system based on micro scanners working in the near infrared range. Packaging issues and measurement results will be discussed as well.

  15. Underwater sensor networks: applications, advances and challenges.

    PubMed

    Heidemann, John; Stojanovic, Milica; Zorzi, Michele

    2012-01-13

    This paper examines the main approaches and challenges in the design and implementation of underwater wireless sensor networks. We summarize key applications and the main phenomena related to acoustic propagation, and discuss how they affect the design and operation of communication systems and networking protocols at various layers. We also provide an overview of communications hardware, testbeds and simulation tools available to the research community.

  16. Advanced Interconnect Roadmap for Space Applications

    NASA Technical Reports Server (NTRS)

    Galbraith, Lissa

    1999-01-01

    This paper presents the NASA electronic parts and packaging program for space applications. The topics include: 1) Forecasts; 2) Technology Challenges; 3) Research Directions; 4) Research Directions for Chip on Board (COB); 5) Research Directions for HDPs: Multichip Modules (MCMs); 6) Research Directions for Microelectromechanical systems (MEMS); 7) Research Directions for Photonics; and 8) Research Directions for Materials. This paper is presented in viewgraph form.

  17. Advanced giant magnetoresistance technology for measurement applications

    NASA Astrophysics Data System (ADS)

    Weiss, Roland; Mattheis, Roland; Reiss, Günter

    2013-08-01

    Giant magnetoresistance (GMR) sensors are considered one of the first real applications of nanotechnology. They consist of nm-thick layered structures where ferromagnetic metals are sandwiched by nonmagnetic metals. Such multilayered films produce a large change in resistance (typically 10 to 20%) when subjected to a magnetic field, compared with a maximum change of a few per cent for other types of magnetic sensors. This technology has been intensively used in read heads for hard disk drives and now increasingly finds applications due to the high sensitivity and signal-to-noise ratio. Additionally these sensors are compatible with miniaturization and thus offer a high spatial resolution combined with a frequency range up to the 100 MHz regime and simple electronic conditioning. In this review, we first discuss the basics of the underlying magnetoresistance effects in layered structures and then present three prominent examples for future applications: in the field of current sensing the new GMR sensors offer high bandwidth and good accuracy in a space-saving open loop measurement configuration. In rotating systems they can be used for multiturn angle measurements, and in biotechnology the detection of magnetic particles enables the quantitative measurement of biomolecule concentrations.

  18. Advances and applications of occupancy models

    USGS Publications Warehouse

    Bailey, Larissa; MacKenzie, Darry I.; Nichols, James D.

    2013-01-01

    Summary: The past decade has seen an explosion in the development and application of models aimed at estimating species occurrence and occupancy dynamics while accounting for possible non-detection or species misidentification. We discuss some recent occupancy estimation methods and the biological systems that motivated their development. Collectively, these models offer tremendous flexibility, but simultaneously place added demands on the investigator. Unlike many mark–recapture scenarios, investigators utilizing occupancy models have the ability, and responsibility, to define their sample units (i.e. sites), replicate sampling occasions, time period over which species occurrence is assumed to be static and even the criteria that constitute ‘detection’ of a target species. Subsequent biological inference and interpretation of model parameters depend on these definitions and the ability to meet model assumptions. We demonstrate the relevance of these definitions by highlighting applications from a single biological system (an amphibian–pathogen system) and discuss situations where the use of occupancy models has been criticized. Finally, we use these applications to suggest future research and model development.

  19. Advances in photorefractive polymers and applications

    NASA Astrophysics Data System (ADS)

    Blanche, P.-A.; Lynn, B.; Norwood, R. A.; Peyghambarian, N.

    2015-09-01

    Photorefractive (PR) polymers change their index of refraction upon illumination through a series of electronic phenomena that makes these materials one of the most complex organic systems known. The refractive index change is dynamic and fully reversible, making PR materials very interesting for a large variety of applications such as holography and 3D display. In order to improve the recording speed and achieve videorate for our stereographic display application, we have introduced a new type of electrode geometry where the anode and cathode are in the same plane and are shaped as interpenetrating combs. This type of electrode geometry does not require the sample to be tilted with respect to the writing beams to record the hologram, which is a significant advantage. To monitor the highly non-homogeneous field resulting from this configuration, we used a multiphoton microscope to directly observe the chromophore orientation in situ upon the application of an electric field. Most recently, we developed a fast repetition rate laser (10kHz) where the pulse width can be adjusted from microseconds to milliseconds so that, in conjunction with a ns Q-switched Nd:YAG laser and an externally chopped CW laser, the diffraction efficiency of the material could be measured over 9 orders of magnitude. This measurement helps us better understand the mechanism of grating buildup inside photorefractive polymers.

  20. Advanced helium magnetometer for space applications

    NASA Technical Reports Server (NTRS)

    Slocum, Robert E.

    1987-01-01

    The goal of this effort was demonstration of the concepts for an advanced helium magnetometer which meets the demands of future NASA earth orbiting, interplanetary, solar, and interstellar missions. The technical effort focused on optical pumping of helium with tunable solid state lasers. We were able to demonstrate the concept of a laser pumped helium magnetometer with improved accuracy, low power, and sensitivity of the order of 1 pT. A number of technical approaches were investigated for building a solid state laser tunable to the helium absorption line at 1083 nm. The laser selected was an Nd-doped LNA crystal pumped by a diode laser. Two laboratory versions of the lanthanum neodymium hexa-aluminate (LNA) laser were fabricated and used to conduct optical pumping experiments in helium and demonstrate laser pumped magnetometer concepts for both the low field vector mode and the scalar mode of operation. A digital resonance spectrometer was designed and built in order to evaluate the helium resonance signals and observe scalar magnetometer operation. The results indicate that the laser pumped sensor in the VHM mode is 45 times more sensitive than a lamp pumped sensor for identical system noise levels. A study was made of typical laser pumped resonance signals in the conventional magnetic resonance mode. The laser pumped sensor was operated as a scalar magnetometer, and it is concluded that magnetometers with 1 pT sensitivity can be achieved with the use of laser pumping and stable laser pump sources.

  1. Ceramics for advanced O2/H2 application

    NASA Technical Reports Server (NTRS)

    Carpenter, H. W.

    1985-01-01

    Ceramics are prime candidate materials for advanced rocket engines because they possess high-temperature capability, a tolerance for aggressive environments, and low density. A program was conducted to assess the applicability of structural ceramics to advanced versions of the Space Shuttle main engine (SSME). Operating conditions of ceramic turbine components were defined and each component in the hot-gas path was assessed in regard to materials selection, manufacturing process and feasibility, and relative structural reliability. The conclusion is that ceramic components would be viable in advanced SSME turbopumps.

  2. SYSTEM CONSIDERATIONS FOR MASKLESS LITHOGRAPHY

    SciTech Connect

    Karnowski, Thomas Paul; Joy, David; Allard Jr, Lawrence Frederick; Clonts, Lloyd G

    2004-01-01

    Lithographic processes for printing device structures on integrated circuits (ICs) are the fundamental technology behind Moore's law. Next-generation techniques like maskless lithography or ML2 have the advantage that the long, tedious and expensive process of fabricating a unique mask for the manufactured chip is not necessary. However, there are some rather daunting problems with establishing ML2 as a viable commercial technology. The data rate necessary for ML2 to be competitive in manufacturing is not feasible with technology in the near future. There is also doubt that the competing technologies for the writing mechanisms and corresponding photoresist (or analogous medium) will be able to accurately produce the desired patterns necessary to produce multi-layer semiconductor devices. In this work, we model the maskless printing system from a signal processing point of view, utilizing image processing algorithms and concepts to study the effects of various real-world constraints and their implications for a ML2 system. The ML2 elements are discrete devices, and it is doubtful that their motion can be controlled to the level where a one-for-one element to exposed pixel relationship is allowable. Some level of sub-element resolution can be achieved with gray scale levels, but with the highly integrated manufacturing practices required to achieve massive parallelism, the most effective elements will be simple on-off switches that fire a fixed level of energy at the target medium. Consequently gray-scale level devices are likely not an option. Another problem with highly integrated manufacturing methods is device uniformity. Consequently, we analyze the redundant scanning array concept (RSA) conceived by Berglund et al. which can defeat many of these problems. We determine some basic equations governing its application and we focus on applying the technique to an array of low-energy electron emitters. Using the results of Monte Carlo simulations on electron beam

  3. LBB application in the US operating and advanced reactors

    SciTech Connect

    Wichman, K.; Tsao, J.; Mayfield, M.

    1997-04-01

    The regulatory application of leak before break (LBB) for operating and advanced reactors in the U.S. is described. The U.S. Nuclear Regulatory Commission (NRC) has approved the application of LBB for six piping systems in operating reactors: reactor coolant system primary loop piping, pressurizer surge, safety injection accumulator, residual heat removal, safety injection, and reactor coolant loop bypass. The LBB concept has also been applied in the design of advanced light water reactors. LBB applications, and regulatory considerations, for pressurized water reactors and advanced light water reactors are summarized in this paper. Technology development for LBB performed by the NRC and the International Piping Integrity Research Group is also briefly summarized.

  4. 3D Stretchable Arch Ribbon Array Fabricated via Grayscale Lithography.

    PubMed

    Pang, Yu; Shu, Yi; Shavezipur, Mohammad; Wang, Xuefeng; Mohammad, Mohammad Ali; Yang, Yi; Zhao, Haiming; Deng, Ningqin; Maboudian, Roya; Ren, Tian-Ling

    2016-01-01

    Microstructures with flexible and stretchable properties display tremendous potential applications including integrated systems, wearable devices and bio-sensor electronics. Hence, it is essential to develop an effective method for fabricating curvilinear and flexural microstructures. Despite significant advances in 2D stretchable inorganic structures, large scale fabrication of unique 3D microstructures at a low cost remains challenging. Here, we demonstrate that the 3D microstructures can be achieved by grayscale lithography to produce a curved photoresist (PR) template, where the PR acts as sacrificial layer to form wavelike arched structures. Using plasma-enhanced chemical vapor deposition (PECVD) process at low temperature, the curved PR topography can be transferred to the silicon dioxide layer. Subsequently, plasma etching can be used to fabricate the arched stripe arrays. The wavelike silicon dioxide arch microstructure exhibits Young modulus and fracture strength of 52 GPa and 300 MPa, respectively. The model of stress distribution inside the microstructure was also established, which compares well with the experimental results. This approach of fabricating a wavelike arch structure may become a promising route to produce a variety of stretchable sensors, actuators and circuits, thus providing unique opportunities for emerging classes of robust 3D integrated systems.

  5. 3D Stretchable Arch Ribbon Array Fabricated via Grayscale Lithography

    PubMed Central

    Pang, Yu; Shu, Yi; Shavezipur, Mohammad; Wang, Xuefeng; Mohammad, Mohammad Ali; Yang, Yi; Zhao, Haiming; Deng, Ningqin; Maboudian, Roya; Ren, Tian-Ling

    2016-01-01

    Microstructures with flexible and stretchable properties display tremendous potential applications including integrated systems, wearable devices and bio-sensor electronics. Hence, it is essential to develop an effective method for fabricating curvilinear and flexural microstructures. Despite significant advances in 2D stretchable inorganic structures, large scale fabrication of unique 3D microstructures at a low cost remains challenging. Here, we demonstrate that the 3D microstructures can be achieved by grayscale lithography to produce a curved photoresist (PR) template, where the PR acts as sacrificial layer to form wavelike arched structures. Using plasma-enhanced chemical vapor deposition (PECVD) process at low temperature, the curved PR topography can be transferred to the silicon dioxide layer. Subsequently, plasma etching can be used to fabricate the arched stripe arrays. The wavelike silicon dioxide arch microstructure exhibits Young modulus and fracture strength of 52 GPa and 300 MPa, respectively. The model of stress distribution inside the microstructure was also established, which compares well with the experimental results. This approach of fabricating a wavelike arch structure may become a promising route to produce a variety of stretchable sensors, actuators and circuits, thus providing unique opportunities for emerging classes of robust 3D integrated systems. PMID:27345766

  6. 3D Stretchable Arch Ribbon Array Fabricated via Grayscale Lithography

    NASA Astrophysics Data System (ADS)

    Pang, Yu; Shu, Yi; Shavezipur, Mohammad; Wang, Xuefeng; Mohammad, Mohammad Ali; Yang, Yi; Zhao, Haiming; Deng, Ningqin; Maboudian, Roya; Ren, Tian-Ling

    2016-06-01

    Microstructures with flexible and stretchable properties display tremendous potential applications including integrated systems, wearable devices and bio-sensor electronics. Hence, it is essential to develop an effective method for fabricating curvilinear and flexural microstructures. Despite significant advances in 2D stretchable inorganic structures, large scale fabrication of unique 3D microstructures at a low cost remains challenging. Here, we demonstrate that the 3D microstructures can be achieved by grayscale lithography to produce a curved photoresist (PR) template, where the PR acts as sacrificial layer to form wavelike arched structures. Using plasma-enhanced chemical vapor deposition (PECVD) process at low temperature, the curved PR topography can be transferred to the silicon dioxide layer. Subsequently, plasma etching can be used to fabricate the arched stripe arrays. The wavelike silicon dioxide arch microstructure exhibits Young modulus and fracture strength of 52 GPa and 300 MPa, respectively. The model of stress distribution inside the microstructure was also established, which compares well with the experimental results. This approach of fabricating a wavelike arch structure may become a promising route to produce a variety of stretchable sensors, actuators and circuits, thus providing unique opportunities for emerging classes of robust 3D integrated systems.

  7. 3D Stretchable Arch Ribbon Array Fabricated via Grayscale Lithography.

    PubMed

    Pang, Yu; Shu, Yi; Shavezipur, Mohammad; Wang, Xuefeng; Mohammad, Mohammad Ali; Yang, Yi; Zhao, Haiming; Deng, Ningqin; Maboudian, Roya; Ren, Tian-Ling

    2016-01-01

    Microstructures with flexible and stretchable properties display tremendous potential applications including integrated systems, wearable devices and bio-sensor electronics. Hence, it is essential to develop an effective method for fabricating curvilinear and flexural microstructures. Despite significant advances in 2D stretchable inorganic structures, large scale fabrication of unique 3D microstructures at a low cost remains challenging. Here, we demonstrate that the 3D microstructures can be achieved by grayscale lithography to produce a curved photoresist (PR) template, where the PR acts as sacrificial layer to form wavelike arched structures. Using plasma-enhanced chemical vapor deposition (PECVD) process at low temperature, the curved PR topography can be transferred to the silicon dioxide layer. Subsequently, plasma etching can be used to fabricate the arched stripe arrays. The wavelike silicon dioxide arch microstructure exhibits Young modulus and fracture strength of 52 GPa and 300 MPa, respectively. The model of stress distribution inside the microstructure was also established, which compares well with the experimental results. This approach of fabricating a wavelike arch structure may become a promising route to produce a variety of stretchable sensors, actuators and circuits, thus providing unique opportunities for emerging classes of robust 3D integrated systems. PMID:27345766

  8. Tunable Nanopatterning of Conductive Polymers via Electrohydrodynamic Lithography.

    PubMed

    Rickard, Jonathan James Stanley; Farrer, Ian; Oppenheimer, Pola Goldberg

    2016-03-22

    An increasing number of technologies require the fabrication of conductive structures on a broad range of scales and over large areas. Here, we introduce advanced yet simple electrohydrodynamic lithography (EHL) for patterning conductive polymers directly on a substrate with high fidelity. We illustrate the generality of this robust, low-cost method by structuring thin polypyrrole films via electric-field-induced instabilities, yielding well-defined conductive structures with feature sizes ranging from tens of micrometers to hundreds of nanometers. Exploitation of a conductive polymer induces free charge suppression of the field in the polymer film, paving the way for accessing scale sizes in the low submicron range. We show the feasibility of the polypyrrole-based structures for field-effect transistor devices. Controlled EHL pattering of conductive polymer structures at the micro and nano scale demonstrated in this study combined with the possibility of effectively tuning the dimensions of the tailor-made architectures might herald a route toward various submicron device applications in supercapacitors, photovoltaics, sensors, and electronic displays. PMID:26905779

  9. Tunable Nanopatterning of Conductive Polymers via Electrohydrodynamic Lithography

    PubMed Central

    2016-01-01

    An increasing number of technologies require the fabrication of conductive structures on a broad range of scales and over large areas. Here, we introduce advanced yet simple electrohydrodynamic lithography (EHL) for patterning conductive polymers directly on a substrate with high fidelity. We illustrate the generality of this robust, low-cost method by structuring thin polypyrrole films via electric-field-induced instabilities, yielding well-defined conductive structures with feature sizes ranging from tens of micrometers to hundreds of nanometers. Exploitation of a conductive polymer induces free charge suppression of the field in the polymer film, paving the way for accessing scale sizes in the low submicron range. We show the feasibility of the polypyrrole-based structures for field-effect transistor devices. Controlled EHL pattering of conductive polymer structures at the micro and nano scale demonstrated in this study combined with the possibility of effectively tuning the dimensions of the tailor-made architectures might herald a route toward various submicron device applications in supercapacitors, photovoltaics, sensors, and electronic displays. PMID:26905779

  10. X-ray lithography source

    DOEpatents

    Piestrup, M.A.; Boyers, D.G.; Pincus, C.

    1991-12-31

    A high-intensity, inexpensive X-ray source for X-ray lithography for the production of integrated circuits is disclosed. Foil stacks are bombarded with a high-energy electron beam of 25 to 250 MeV to produce a flux of soft X-rays of 500 eV to 3 keV. Methods of increasing the total X-ray power and making the cross section of the X-ray beam uniform are described. Methods of obtaining the desired X-ray-beam field size, optimum frequency spectrum and eliminating the neutron flux are all described. A method of obtaining a plurality of station operation is also described which makes the process more efficient and economical. The satisfying of these issues makes transition radiation an excellent moderate-priced X-ray source for lithography. 26 figures.

  11. X-ray lithography source

    DOEpatents

    Piestrup, Melvin A.; Boyers, David G.; Pincus, Cary

    1991-01-01

    A high-intensity, inexpensive X-ray source for X-ray lithography for the production of integrated circuits. Foil stacks are bombarded with a high-energy electron beam of 25 to 250 MeV to produce a flux of soft X-rays of 500 eV to 3 keV. Methods of increasing the total X-ray power and making the cross section of the X-ray beam uniform are described. Methods of obtaining the desired X-ray-beam field size, optimum frequency spectrum and elminating the neutron flux are all described. A method of obtaining a plurality of station operation is also described which makes the process more efficient and economical. The satisfying of these issues makes transition radiation an exellent moderate-priced X-ray source for lithography.

  12. EUV Lithography: New Metrology Challenges

    SciTech Connect

    Wood, Obert

    2007-09-26

    Extreme ultraviolet lithography is one of the most promising printing techniques for high volume semiconductor manufacturing at the 22 nm half-pitch device node and beyond. Because its imaging wavelength is approximately twenty times shorter than those currently in use (13.5 nm versus 193-248 nm) and because EUV optics and masks must be provided with highly-precise reflective multilayer coatings, EUV lithography presents a number of new and difficult metrology challenges. In this paper, the current status of the metrology tools being used to characterize the figure and finish of EUV mirror surfaces, the defectivity and flatness of EUV mask blanks and the outgassing rates of EUV resist materials are discussed.

  13. Advanced new materials with various applications

    NASA Astrophysics Data System (ADS)

    Radu-Claudiu, Fierascu; Rodica-Mariana, Ion; Irina, Dumitriu

    2009-01-01

    Nanotechnology is the manufacture and science of materials with at least one dimension in the nanometer scale [1]. Many nanomaterials have novel chemical and biological properties and most of them are not naturally occurring. Carbon nanotubes (CNTs) are an example of a carbon-based nanomaterial which has won enormous popularity in nanotechnology for its unique properties and applications [2]. CNTs have highly desirable physicochemical properties for use in commercial, environmental and medical sectors. The inclusion of CNTs to improve the quality and performance of many widely used products, as well as potentially in medicine, will dramatically affect occupational and public exposure to CNT based nanomaterials in the near future [3].

  14. Molecular dynamics simulations: advances and applications

    PubMed Central

    Hospital, Adam; Goñi, Josep Ramon; Orozco, Modesto; Gelpí, Josep L

    2015-01-01

    Molecular dynamics simulations have evolved into a mature technique that can be used effectively to understand macromolecular structure-to-function relationships. Present simulation times are close to biologically relevant ones. Information gathered about the dynamic properties of macromolecules is rich enough to shift the usual paradigm of structural bioinformatics from studying single structures to analyze conformational ensembles. Here, we describe the foundations of molecular dynamics and the improvements made in the direction of getting such ensemble. Specific application of the technique to three main issues (allosteric regulation, docking, and structure refinement) is discussed. PMID:26604800

  15. Advanced COIL technologies for field applications

    NASA Astrophysics Data System (ADS)

    Tei, Kazuyoku; Sugimoto, Daichi; Ito, T.; Watanabe, G.; Vyskubenko, O.; Takeuchi, N.; Muto, S.; Kenzo, N.; Fujioka, Tomoo

    2005-01-01

    Chemical oxygen-iodine laser (COIL) has a great potential for applications such as decommissioning and dismantlement (D&D) of nuclear reactor, rock destruction and removal and extraction of a natural resource (Methane hydrate) because of the unique characteristics such as power scalability, high optical beam quality and optical fiber beam. Five-kilowatt Chemical oxygen-iodine laser (COIL) test facility has been developed. The chemical efficiency of 27% has been demonstrated with a moderate beam quality for optical fiber coupling. Our research program contains conventional/ejector-COIL scheme, Jet-SOG/Mist-SOG optimization, fiber delivery and long-term operation.

  16. Molecular dynamics simulations: advances and applications

    PubMed Central

    Hospital, Adam; Goñi, Josep Ramon; Orozco, Modesto; Gelpí, Josep L

    2015-01-01

    Molecular dynamics simulations have evolved into a mature technique that can be used effectively to understand macromolecular structure-to-function relationships. Present simulation times are close to biologically relevant ones. Information gathered about the dynamic properties of macromolecules is rich enough to shift the usual paradigm of structural bioinformatics from studying single structures to analyze conformational ensembles. Here, we describe the foundations of molecular dynamics and the improvements made in the direction of getting such ensemble. Specific application of the technique to three main issues (allosteric regulation, docking, and structure refinement) is discussed.

  17. Protein assay structured on paper by using lithography

    NASA Astrophysics Data System (ADS)

    Wilhelm, E.; Nargang, T. M.; Al Bitar, W.; Waterkotte, B.; Rapp, B. E.

    2015-03-01

    There are two main challenges in producing a robust, paper-based analytical device. The first one is to create a hydrophobic barrier which unlike the commonly used wax barriers does not break if the paper is bent. The second one is the creation of the (bio-)specific sensing layer. For this proteins have to be immobilized without diminishing their activity. We solve both problems using light-based fabrication methods that enable fast, efficient manufacturing of paper-based analytical devices. The first technique relies on silanization by which we create a flexible hydrophobic barrier made of dimethoxydimethylsilane. The second technique demonstrated within this paper uses photobleaching to immobilize proteins by means of maskless projection lithography. Both techniques have been tested on a classical lithography setup using printed toner masks and on a lithography system for maskless lithography. Using these setups we could demonstrate that the proposed manufacturing techniques can be carried out at low costs. The resolution of the paper-based analytical devices obtained with static masks was lower due to the lower mask resolution. Better results were obtained using advanced lithography equipment. By doing so we demonstrated, that our technique enables fabrication of effective hydrophobic boundary layers with a thickness of only 342 μm. Furthermore we showed that flourescine-5-biotin can be immobilized on the non-structured paper and be employed for the detection of streptavidinalkaline phosphatase. By carrying out this assay on a paper-based analytical device which had been structured using the silanization technique we proofed biological compatibility of the suggested patterning technique.

  18. Advanced Pattern Material for Investment Casting Applications

    SciTech Connect

    F. Douglas Neece Neil Chaudhry

    2006-02-08

    Cleveland Tool and Machine (CTM) of Cleveland, Ohio in conjunction with Harrington Product Development Center (HPDC) of Cincinnati, Ohio have developed an advanced, dimensionally accurate, temperature-stable, energy-efficient and cost-effective material and process to manufacture patterns for the investment casting industry. In the proposed technology, FOPAT (aFOam PATtern material) has been developed which is especially compatible with the investment casting process and offers the following advantages: increased dimensional accuracy; increased temperature stability; lower cost per pattern; less energy consumption per pattern; decreased cost of pattern making equipment; decreased tooling cost; increased casting yield. The present method for investment casting is "the lost wax" process, which is exactly that, the use of wax as a pattern material, which is then melted out or "lost" from the ceramic shell. The molten metal is then poured into the ceramic shell to produce a metal casting. This process goes back thousands of years and while there have been improvements in the wax and processing technology, the material is basically the same, wax. The proposed technology is based upon an established industrial process of "Reaction Injection Molding" (RIM) where two components react when mixed and then "molded" to form a part. The proposed technology has been modified and improved with the needs of investment casting in mind. A proprietary mix of components has been formulated which react and expand to form a foam-like product. The result is an investment casting pattern with smooth surface finish and excellent dimensional predictability along with the other key benefits listed above.

  19. Resolution Improvement and Pattern Generator Development for theMaskless Micro-Ion-Beam Reduction Lithography System

    SciTech Connect

    Jiang, Ximan

    2006-05-18

    The shrinking of IC devices has followed the Moore's Law for over three decades, which states that the density of transistors on integrated circuits will double about every two years. This great achievement is obtained via continuous advance in lithography technology. With the adoption of complicated resolution enhancement technologies, such as the phase shifting mask (PSM), the optical proximity correction (OPC), optical lithography with wavelength of 193 nm has enabled 45 nm printing by immersion method. However, this achievement comes together with the skyrocketing cost of masks, which makes the production of low volume application-specific IC (ASIC) impractical. In order to provide an economical lithography approach for low to medium volume advanced IC fabrication, a maskless ion beam lithography method, called Maskless Micro-ion-beam Reduction Lithography (MMRL), has been developed in the Lawrence Berkeley National Laboratory. The development of the prototype MMRL system has been described by Dr. Vinh Van Ngo in his Ph.D. thesis. But the resolution realized on the prototype MMRL system was far from the design expectation. In order to improve the resolution of the MMRL system, the ion optical system has been investigated. By integrating a field-free limiting aperture into the optical column, reducing the electromagnetic interference and cleaning the RF plasma, the resolution has been improved to around 50 nm. Computational analysis indicates that the MMRL system can be operated with an exposure field size of 0.25 mm and a beam half angle of 1.0 mrad on the wafer plane. Ion-ion interactions have been studied with a two-particle physics model. The results are in excellent agreement with those published by the other research groups. The charge-interaction analysis of MMRL shows that the ion-ion interactions must be reduced in order to obtain a throughput higher than 10 wafers per hour on 300-mm wafers. In addition, two different maskless lithography strategies

  20. Advancing differential atom interferometry for space applications

    NASA Astrophysics Data System (ADS)

    Chiow, Sheng-Wey; Williams, Jason; Yu, Nan

    2016-05-01

    Atom interferometer (AI) based sensors exhibit precision and accuracy unattainable with classical sensors, thanks to the inherent stability of atomic properties. Dual atomic sensors operating in a differential mode further extend AI applicability beyond environmental disturbances. Extraction of the phase difference between dual AIs, however, typically introduces uncertainty and systematic in excess of that warranted by each AI's intrinsic noise characteristics, especially in practical applications and real time measurements. In this presentation, we report our efforts in developing practical schemes for reducing noises and enhancing sensitivities in the differential AI measurement implementations. We will describe an active phase extraction method that eliminates the noise overhead and demonstrates a performance boost of a gravity gradiometer by a factor of 3. We will also describe a new long-baseline approach for differential AI measurements in a laser ranging assisted AI configuration. The approach uses well-developed AIs for local measurements but leverage the mature schemes of space laser interferometry for LISA and GRACE. This research was carried out at the Jet Propulsion Laboratory, California Institute of Technology, under a Contract with NASA.

  1. Advanced Materials and Coatings for Aerospace Applications

    NASA Technical Reports Server (NTRS)

    Miyoshi, Kazuhisa

    2004-01-01

    In the application area of aerospace tribology, researchers and developers must guarantee the highest degree of reliability for materials, components, and systems. Even a small tribological failure can lead to catastrophic results. The absence of the required knowledge of tribology, as Professor H.P. Jost has said, can act as a severe brake in aerospace vehicle systems-and indeed has already done so. Materials and coatings must be able to withstand the aerospace environments that they encounter, such as vacuum terrestrial, ascent, and descent environments; be resistant to the degrading effects of air, water vapor, sand, foreign substances, and radiation during a lengthy service; be able to withstand the loads, stresses, and temperatures encountered form acceleration and vibration during operation; and be able to support reliable tribological operations in harsh environments throughout the mission of the vehicle. This presentation id divided into two sections: surface properties and technology practice related to aerospace tribology. The first section is concerned with the fundamental properties of the surfaces of solid-film lubricants and related materials and coatings, including carbon nanotubes. The second is devoted to applications. Case studies are used to review some aspects of real problems related to aerospace systems to help engineers and scientists to understand the tribological issues and failures. The nature of each problem is analyzed, and the tribological properties are examined. All the fundamental studies and case studies were conducted at the NASA Glenn Research Center.

  2. A survey of advanced battery systems for space applications

    NASA Technical Reports Server (NTRS)

    Attia, Alan I.

    1989-01-01

    The results of a survey on advanced secondary battery systems for space applications are presented. Fifty-five battery experts from government, industry and universities participated in the survey by providing their opinions on the use of several battery types for six space missions, and their predictions of likely technological advances that would impact the development of these batteries. The results of the survey predict that only four battery types are likely to exceed a specific energy of 150 Wh/kg and meet the safety and reliability requirements for space applications within the next 15 years.

  3. The New X-Ray Lithography Beamline BL1 At DELTA

    SciTech Connect

    Lietz, D.; Paulus, M.; Sternemann, C.; Berges, U.; Hippert, B.; Tolan, M.

    2010-06-23

    Lithography using synchrotron radiation in the x-ray regime provides a powerful method to produce mechanical components of sub-millimeter size with a very good quality for microtechnological applications. In recent years the demand for x-ray lithography beamtime for industrial production of microparts increased rapidly resulting in the development of new experimental endstations at synchrotron radiation sources dedicated for the production of micromechanical devices. We present in this work the layout of the new x-ray lithography beamline BL1 at the synchrotron radiation source DELTA in Dortmund and discuss first results of exposure tests.

  4. Applications of advanced diffractive optical elements

    NASA Technical Reports Server (NTRS)

    Welch, W. Hudson; Morris, James E.; Feldman, Michael R.

    1993-01-01

    Digital Optics Corporation is a UNC-Charlotte spin-off company, established to transfer technology developed at UNC-Charlotte for the design and manufacture Computer Generated Holograms (CGH's) and to market products based on CGH technology. DOC acquired core technologies from UNC-Charlotte including: (1) a CGH encoding process that can provide holograms with extremely high diffraction efficiency; (2) a low cost, high precision CGH manufacturing process; and (3) extensive holographic and refractive element design capabilities for design and evaluation of complex optical systems. These technologies have been used to design and/or manufacture optical components for a variety of applications including: (1) generation of Spot arrays; (2) fiber optic coupling elements; (3) optical interconnects between VLSI chips within and between multichip modules; and (4) imaging systems for head-mounted displays (HMD's).

  5. An advanced unmanned vehicle for remote applications

    SciTech Connect

    Pletta, J.B.; Sackos, J.

    1998-03-01

    An autonomous mobile robotic capability is critical to developing remote work applications for hazardous environments. A few potential applications include humanitarian demining and ordnance neutralization, extraterrestrial science exploration, and hazardous waste cleanup. The ability of the remote platform to sense and maneuver within its environment is a basic technology requirement which is currently lacking. This enabling technology will open the door for force multiplication and cost effective solutions to remote operations. The ultimate goal of this work is to develop a mobile robotic platform that can identify and avoid local obstacles as it traverses from its current location to a specified destination. This goal directed autonomous navigation scheme uses the Global Positioning System (GPS) to identify the robot`s current coordinates in space and neural network processing of LADAR range images for local obstacle detection and avoidance. The initial year funding provided by this LDRD project has developed a small exterior mobile robotic development platform and a fieldable version of Sandia`s Scannerless Range Imager (SRI) system. The robotic testbed platform is based on the Surveillance And Reconnaissance ground Equipment (SARGE) robotic vehicle design recently developed for the US DoD. Contingent upon follow-on funding, future enhancements will develop neural network processing of the range map data to traverse unstructured exterior terrain while avoiding obstacles. The SRI will provide real-time range images to a neural network for autonomous guidance. Neural network processing of the range map data will allow real-time operation on a Pentium based embedded processor board.

  6. Multidirectional mobilities: Advanced measurement techniques and applications

    NASA Astrophysics Data System (ADS)

    Ivarsson, Lars Holger

    Today high noise-and-vibration comfort has become a quality sign of products in sectors such as the automotive industry, aircraft, components, households and manufacturing. Consequently, already in the design phase of products, tools are required to predict the final vibration and noise levels. These tools have to be applicable over a wide frequency range with sufficient accuracy. During recent decades a variety of tools have been developed such as transfer path analysis (TPA), input force estimation, substructuring, coupling by frequency response functions (FRF) and hybrid modelling. While these methods have a well-developed theoretical basis, their application combined with experimental data often suffers from a lack of information concerning rotational DOFs. In order to measure response in all 6 DOFs (including rotation), a sensor has been developed, whose special features are discussed in the thesis. This transducer simplifies the response measurements, although in practice the excitation of moments appears to be more difficult. Several excitation techniques have been developed to enable measurement of multidirectional mobilities. For rapid and simple measurement of the loaded mobility matrix, a MIMO (Multiple Input Multiple Output) technique is used. The technique has been tested and validated on several structures of different complexity. A second technique for measuring the loaded 6-by-6 mobility matrix has been developed. This technique employs a model of the excitation set-up, and with this model the mobility matrix is determined from sequential measurements. Measurements on ``real'' structures show that both techniques give results of similar quality, and both are recommended for practical use. As a further step, a technique for measuring the unloaded mobilities is presented. It employs the measured loaded mobility matrix in order to calculate compensation forces and moments, which are later applied in order to compensate for the loading of the

  7. Reduction of nanowire diameter beyond lithography limits by controlled catalyst dewetting

    NASA Astrophysics Data System (ADS)

    Calahorra, Yonatan; Kerlich, Alexander; Amram, Dor; Gavrilov, Arkady; Cohen, Shimon; Ritter, Dan

    2016-04-01

    Catalyst assisted vapour-liquid-solid is the most common method to realize bottom-up nanowire growth; establishing a parallel process for obtaining nanoscale catalysts at pre-defined locations is paramount for further advancement towards commercial nanowire applications. Herein, the effect of a selective area mask on the dewetting of metallic nanowire catalysts, deposited within lithography-defined mask pinholes, is reported. It was found that thin disc-like catalysts, with diameters of 120-450 nm, were transformed through dewetting into hemisphere-like catalysts, having diameters 2-3 fold smaller; the process was optimized to about 95% yield in preventing catalyst splitting, as would otherwise be expected due to their thickness-to-diameter ratio, which was as low as 1/60. The catalysts subsequently facilitated InP and InAs nanowire growth. We suggest that the mask edges prevent surface migration mediated spreading of the dewetted metal, and therefore induce its agglomeration into a single particle. This result presents a general strategy to diminish lithography-set dimensions for NW growth, and may answer a fundamental challenge faced by bottom-up nanowire technology.

  8. Nanoimprint lithography using TiO2-SiO2 ultraviolet curable materials

    NASA Astrophysics Data System (ADS)

    Takei, Satoshi

    2015-05-01

    Ultraviolet nanoimprint lithography has great potential for commercial device applications that are closest to production such as optical gratings, planar waveguides, photonic crystals, semiconductor, displays, solar cell panel, sensors, highbrightness LEDs, OLEDs, and optical data storage. I report and demonstrate the newly TiO2-SiO2 ultraviolet curable materials with 20-25 wt% ratio of high titanium for CF4/O2 etch selectivity using nanoimprint lithography process. The multiple structured three-dimensional micro- and nanolines patterns were observed to be successfully patterned over the large areas. The effect of titanium concentration on CF4/O2 etch selectivity with pattern transferring carbon layer imprinting time was investigated. CF4/O2 etching rate of the TiO2-SiO2 ultraviolet curable material was approximately 3.8 times lower than that of the referenced SiO2 sol-gel ultraviolet curable material. The TiO2-SiO2 ultraviolet curable material with high titanium concentration has been proved to be versatile in advanced nanofabrication.

  9. [Advances in the application of smart phones in modern medicine].

    PubMed

    Wang, Lin; Hu, Jie; Li, Fei; Wei, Huilin; Li, Ying; Lu, Tianjian; Wang, Shuqi; Xu, Feng

    2014-02-01

    Since smart phones have been developed, significant advances in the function of mobile phone due to the development of software, hardware and accessories have been reached. Till now, smart phones have been engaged in daily life with an increasing impact. As a new medical model, mobile phone medicine is emerging and has found wide spread applications in medicine, especially in diagnosing, monitoring and screening various diseases. In addition, mo bile phone medical application shows great potential trend to improve healthcare in resource-limited regions due to its advantageous features of portability and information communication capability. Nowadays, the scientific and technological issues related to mobile phone medicine have attracted worldwide attention. In this review, we summarize state-of-the-art advances of mobile phone medicine with focus on its diagnostics applications in order to expand the fields of their applications and promote healthcare informatization.

  10. PREFACE: Advanced Materials for Demanding Applications

    NASA Astrophysics Data System (ADS)

    McMillan, Alison; Schofield, Stephen; Kelly, Michael

    2015-02-01

    This was a special conference. It was small enough (60+ delegates) but covering a wide range of topics, under a broad end-use focussed heading. Most conferences today either have hundreds or thousands of delegates or are small and very focussed. The topics ranged over composite materials, the testing of durability aspects of materials, and an eclectic set of papers on radar screening using weak ionized plasmas, composites for microvascular applications, composites in space rockets, and materials for spallation neutron sources etc. There were several papers of new characterisation techniques and, very importantly, several papers that started with the end-user requirements leading back into materials selection. In my own area, there were three talks about the technology for the ultra-precise positioning of individual atoms, donors, and complete monolayers to take modern electronics and optoelectronics ideas closer to the market place. The President of the Institute opened with an experience-based talk on translating innovative technology into business. Everyone gave a generous introduction to bring all-comers up to speed with the burning contemporary issues. Indeed, I wish that a larger cohort of first-year engineering PhD students were present to see the full gamut of what takes a physics idea to a success in the market place. I would urge groups to learn from Prof Alison McMillan (a Vice President of the Institute of Physics) and Steven Schofield, to set up conferences of similar scale and breadth. I took in more than I do from mega-meetings, and in greater depth. Professor Michael Kelly Department of Engineering University of Cambridge

  11. Advanced photovoltaic power system technology for lunar base applications

    NASA Technical Reports Server (NTRS)

    Brinker, David J.; Flood, Dennis J.

    1992-01-01

    The development of an advanced photovoltaic power system that would have application for a manned lunar base is currently planned under the Surface Power element of Pathfinder. Significant mass savings over state-of-the-art photovoltaic/battery systems are possible with the use of advanced lightweight solar arrays coupled with regenerative fuel cell storage. The solar blanket, using either ultrathin GaAs or amorphous silicon solar cells, would be integrated with a reduced-g structure. Regenerative fuel cells with high-pressure gas storage in filament-wound tanks are planned for energy storage. An advanced PV/RFC power system is a leading candidate for a manned lunar base as it offers a tremendous weight advantage over state-of-the-art photovoltaic/battery systems and is comparable in mass to other advanced power generation technologies.

  12. Spacecraft applications of advanced global positioning system technology

    NASA Technical Reports Server (NTRS)

    Huth, Gaylord; Dodds, James; Udalov, Sergei; Austin, Richard; Loomis, Peter; Duboraw, I. Newton, III

    1988-01-01

    The purpose of this study was to evaluate potential uses of Global Positioning System (GPS) in spacecraft applications in the following areas: attitude control and tracking; structural control; traffic control; and time base definition (synchronization). Each of these functions are addressed. Also addressed are the hardware related issues concerning the application of GPS technology and comparisons are provided with alternative instrumentation methods for specific functions required for an advanced low earth orbit spacecraft.

  13. Advanced Boost System Developing for High EGR Applications

    SciTech Connect

    Sun, Harold

    2012-09-30

    To support industry efforts of clean and efficient internal combustion engine development for passenger and commercial applications • This program focuses on turbocharger improvement for medium and light duty diesel applications, from complete system optimization percepective to enable commercialization of advanced diesel combustion technologies, such as HCCI/LTC. • Improve combined turbocharger efficiency up to 10% or fuel economy by 3% on FTP cycle at Tier II Bin 5 emission level.

  14. Photoresist composition for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, G. D.

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods. A photoresist composition for extreme ultraviolet radiation of boron carbide polymers, hydrochlorocarbons and mixtures thereof.

  15. Comparison of measurement methods for microsystem components: application to microstructures made by the deep x-ray lithography process (x-ray LIGA)

    NASA Astrophysics Data System (ADS)

    Meyer, Pascal; Mäder, Olaf; Saile, Volker; Schulz, Joachim

    2009-08-01

    The LIGA (a German acronym for lithography, electroplating and molding) process using highly parallel x-rays permits the production of a microstructure with still unique characteristics: high aspect ratio, high accuracy, high perpendicularity and lower roughness of the side wall. From a marketing point of view, this qualitative description might suffice to attract users to the technology. Regarding widespread commercialization and standardization of x-ray LIGA products, our goal is to establish a rigorous dimensional metrology for which we need to understand and quantify uncertainty, which is the key to accuracy. We report on our metrological study using a coordinate measurement machine (CMM) equipped with a fibre probe (3D measurements) which will be compared to two versions of lateral top-view measurements (2D/surface measurements): an optical microscope provided with a micrometric table and a CMM with an image processing sensor; these two types of measurement methods being complementary. In fact, microsystem technology requires measurements to be performed with precision and accuracy within the range of 0.1 µm. In this paper, we present an analysis and a discussion of both types of measurement systems. The precision and reproducibility of the CMM (with fibre probe) during a two-year study will be exposed; a calibrated series part is being measured every time the machine is used. In this case, the CMM is used as a comparator. Its accuracy and the calibration of the ball diameter using an etalon (ceramic gage block) will be exposed. Furthermore, by taking into account the results obtained by the measurement system analysis (MSA), we will show the measurement's impact on the process by taking as an example the fabrication of mm gold gears for watch industry; a quantitative description of process reproducibility and of the influence of processing parameters influence will be possible in the future.

  16. High resolution patterning for flexible electronics via roll-to-roll nanoimprint lithography

    NASA Astrophysics Data System (ADS)

    Sabik, Sami; de Riet, Joris; Yakimets, Iryna; Smits, Edsger

    2014-03-01

    Flexible electronics is a growing field and is currently maturing in applications such as displays, smart packaging, organic light-emitting diodes and organic photovoltaic cells. In order to process on flexible substrates at high throughput and large areas, novel patterning techniques will be essential. Conventional optical lithography is limited in throughput as well as resolution, and requires several alignment steps to generate multi-layered patterns, required for applications such as thin-film transistors. It therefore remains a complex and expensive process. Nanoimprint lithography is an emerging alternative to optical lithography, demonstrating patterning capabilities over a wide range of resolutions, from several microns down to a few nanometres. For display applications, nanoimprint lithography can be used to pattern various layers. Micron sized thin-film transistors for backplane can be fabricated where a self-aligned geometry is used to decrease the number of alignment steps, and increase the overlay accuracy. In addition, nano-structures can be used for optical applications such as anti-reflective surfaces and nano patterned transparent electrodes. Imprint lithography is a fully roll-to-roll compatible process and enables large area and high throughput fabrication for flexible electronics. In this paper we discuss the possibilities and the challenges of large area patterning by roll-to-roll nanoimprint lithography, reviewing micron and nano sized structures realized on our roll-to-roll equipment. Nano patterned transparent electrodes, moth-eye antireflective coatings, and multilevel structures will be covered.

  17. Application of advanced technologies to future military transports

    NASA Technical Reports Server (NTRS)

    Clark, Rodney L.; Lange, Roy H.; Wagner, Richard D.

    1990-01-01

    Long range military transport technologies are addressed with emphasis of defining the potential benefits of the hybrid laminar flow control (HLFC) concept currently being flight tested. Results of a 1990's global range transport study are presented showing the expected payoff from application of advanced technologies. Technology forecast for military transports is also presented.

  18. Membrane projection lithography

    DOEpatents

    Burckel, David Bruce; Davids, Paul S; Resnick, Paul J; Draper, Bruce L

    2015-03-17

    The various technologies presented herein relate to a three dimensional manufacturing technique for application with semiconductor technologies. A membrane layer can be formed over a cavity. An opening can be formed in the membrane such that the membrane can act as a mask layer to the underlying wall surfaces and bottom surface of the cavity. A beam to facilitate an operation comprising any of implantation, etching or deposition can be directed through the opening onto the underlying surface, with the opening acting as a mask to control the area of the underlying surfaces on which any of implantation occurs, material is removed, and/or material is deposited. The membrane can be removed, a new membrane placed over the cavity and a new opening formed to facilitate another implantation, etching, or deposition operation. By changing the direction of the beam different wall/bottom surfaces can be utilized to form a plurality of structures.

  19. Convolution-variation separation method for efficient modeling of optical lithography.

    PubMed

    Liu, Shiyuan; Zhou, Xinjiang; Lv, Wen; Xu, Shuang; Wei, Haiqing

    2013-07-01

    We propose a general method called convolution-variation separation (CVS) to enable efficient optical imaging calculations without sacrificing accuracy when simulating images for a wide range of process variations. The CVS method is derived from first principles using a series expansion, which consists of a set of predetermined basis functions weighted by a set of predetermined expansion coefficients. The basis functions are independent of the process variations and thus may be computed and stored in advance, while the expansion coefficients depend only on the process variations. Optical image simulations for defocus and aberration variations with applications in robust inverse lithography technology and lens aberration metrology have demonstrated the main concept of the CVS method.

  20. Development in Diagnostics Application to Control Advanced Tokamak Plasma

    SciTech Connect

    Koide, Y.

    2008-03-12

    For continuous operation expected in DEMO, all the plasma current must be non-inductively driven, with self-generated neoclassical bootstrap current being maximized. The control of such steady state high performance tokamak plasma (so-called 'Advanced Tokamak Plasma') is a challenge because of the strong coupling between the current density, the pressure profile and MHD stability. In considering diagnostic needs for the advanced tokamak research, diagnostics for MHD are the most fundamental, since discharges which violate the MHD stability criteria either disrupt or have significantly reduced confinement. This report deals with the development in diagnostic application to control advanced tokamak plasma, with emphasized on recent progress in active feedback control of the current profile and the pressure profile under DEMO-relevant high bootstrap-current fraction. In addition, issues in application of the present-day actuators and diagnostics for the advanced control to DEMO will be briefly addressed, where port space for the advanced control may be limited so as to keep sufficient tritium breeding ratio (TBR)

  1. A survey of advanced battery systems for space applications

    NASA Technical Reports Server (NTRS)

    Attia, Alan I.

    1989-01-01

    The results of a survey on advanced secondary battery systems for space applications are presented. The objectives were: to identify advanced battery systems capable of meeting the requirements of various types of space missions, with significant advantages over currently available batteries, to obtain an accurate estimate of the anticipated improvements of these advanced systems, and to obtain a consensus for the selection of systems most likely to yield the desired improvements. Few advanced systems are likely to exceed a specific energy of 150 Wh/kg and meet the additional requirements of safety and reliability within the next 15 years. The few that have this potential are: (1) regenerative fuel cells, both alkaline and solid polymer electrolyte (SPE) types for large power systems; (2) lithium-intercalatable cathodes, particularly the metal ozides intercalatable cathodes (MnO2 or CoO2), with applications limited to small spacecrafts requiring limited cycle life and low power levels; (3) lithium molten salt systems (e.g., LiAl-FeS2); and (4) Na/beta Alumina/Sulfur or metal chlorides cells. Likely technological advances that would enhance the performance of all the above systems are also identified, in particular: improved bifunctional oxygen electrodes; improved manufacturing technology for thin film lithium electrodes in combination with polymeric electrolytes; improved seals for the lithium molten salt cells; and improved ceramics for sodium/solid electrolyte cells.

  2. Nanostructure patterning on flexible substrates using electron beam lithography

    NASA Astrophysics Data System (ADS)

    Nagaraj, K. S.; Sangeeth, K.; Hegde, G. M.

    2014-06-01

    Patterning nanostructures on flexible substrates plays a key role in the emerging flexible electronics technology. The flexible electronic devices are inexpensive and can be conformed to any shape. The potential applications for such devices are sensors, displays, solar cells, RFID, high-density biochips, optoelectronics etc. E-beam lithography is established as a powerful tool for nanoscale fabrication, but its applicability on insulating flexible substrates is often limited because of surface charging effects. This paper presents the fabrication of nanostructures on insulating flexible substrates using low energy E-beam lithography along with metallic layers for charge dissipation. Nano Structures are patterned on different substrates of materials such as acetate and PET foils. The fabrication process parameters such as the proximity gap of exposure, the exposure dosage and developing conditions have been optimized for each substrate.

  3. Advanced ceramic materials for next-generation nuclear applications

    NASA Astrophysics Data System (ADS)

    Marra, John

    2011-10-01

    The nuclear industry is at the eye of a 'perfect storm' with fuel oil and natural gas prices near record highs, worldwide energy demands increasing at an alarming rate, and increased concerns about greenhouse gas (GHG) emissions that have caused many to look negatively at long-term use of fossil fuels. This convergence of factors has led to a growing interest in revitalization of the nuclear power industry within the United States and across the globe. Many are surprised to learn that nuclear power provides approximately 20% of the electrical power in the US and approximately 16% of the world-wide electric power. With the above factors in mind, world-wide over 130 new reactor projects are being considered with approximately 25 new permit applications in the US. Materials have long played a very important role in the nuclear industry with applications throughout the entire fuel cycle; from fuel fabrication to waste stabilization. As the international community begins to look at advanced reactor systems and fuel cycles that minimize waste and increase proliferation resistance, materials will play an even larger role. Many of the advanced reactor concepts being evaluated operate at high-temperature requiring the use of durable, heat-resistant materials. Advanced metallic and ceramic fuels are being investigated for a variety of Generation IV reactor concepts. These include the traditional TRISO-coated particles, advanced alloy fuels for 'deep-burn' applications, as well as advanced inert-matrix fuels. In order to minimize wastes and legacy materials, a number of fuel reprocessing operations are being investigated. Advanced materials continue to provide a vital contribution in 'closing the fuel cycle' by stabilization of associated low-level and high-level wastes in highly durable cements, ceramics, and glasses. Beyond this fission energy application, fusion energy will demand advanced materials capable of withstanding the extreme environments of high

  4. Benchtop micromolding of polystyrene by soft lithography.

    PubMed

    Wang, Yuli; Balowski, Joseph; Phillips, Colleen; Phillips, Ryan; Sims, Christopher E; Allbritton, Nancy L

    2011-09-21

    Polystyrene (PS), a standard material for cell culture consumable labware, was molded into microstructures with high fidelity of replication by an elastomeric polydimethylsiloxane (PDMS) mold. The process was a simple, benchtop method based on soft lithography using readily available materials. The key to successful replica molding by this simple procedure relies on the use of a solvent, for example, gamma-butyrolactone, which dissolves PS without swelling the PDMS mold. PS solution was added to the PDMS mold, and evaporation of the solvent was accomplished by baking the mold on a hotplate. Microstructures with feature sizes as small as 3 μm and aspect ratios as large as 7 were readily molded. Prototypes of microfluidic chips made from PS were prepared by thermal bonding of a microchannel molded in PS with a flat PS substrate. The PS microfluidic chip displayed much lower adsorption and absorption of hydrophobic molecules (e.g. rhodamine B) compared to a comparable chip created from PDMS. The molded PS surface exhibited stable surface properties after plasma oxidation as assessed by contact angle measurement. The molded, oxidized PS surface remained an excellent surface for cell culture based on cell adhesion and proliferation. To demonstrate the application of this process for cell biology research, PS was micromolded into two different microarray formats, microwells and microposts, for segregation and tracking of non-adherent and adherent cells, respectively. The micromolded PS possessed properties that were ideal for biological and bioanalytical needs, thus making it an alternative material to PDMS and suitable for building lab-on-a-chip devices by soft lithography methods.

  5. Why bother with x-ray lithography?

    NASA Astrophysics Data System (ADS)

    Smith, Henry I.; Schattenburg, Mark L.

    1992-07-01

    The manufacture of state-of-the-art integrated circuits uses UV optical projection lithography. Conventional wisdom (i.e., the trade journals) holds that this technology will take the industry to quarter-micrometer minimum features sizes and below. So, why bother with X-ray lithography? The reason is that lithography is a 'system problem', and proximity X-ray lithography is better matched to that system problem than any other technology, once the initial investment is surmounted. X-ray lithography offers the most cost-effective path to the future of ultra-large-scale integrated circuits with feature sizes of tenth micrometer and below (i.e., gigascale electronics and quantum-effect electronics).

  6. Ultraviolet nanoimprint lithography using cyclodextrin-based porous template for pattern failure reduction

    NASA Astrophysics Data System (ADS)

    Takei, Satoshi; Hanabata, Makoto

    2015-10-01

    An approach to ultraviolet (UV) nanoimprint lithography using a cyclodextrin-based porous template was investigated for the reduction of air trapping and template damage caused by gases such as nitrogen and oxygen generated from UV cross-linked materials. The accuracy of the printed pattern using UV nanoimprint lithography with the porous transparent template was improved because of enhanced material adsorption and increased permeability to gaseous species. The use of volatile solvents in the UV cross-linked materials for nanoimprint lithography has been limited because of high pattern failure rates. However, using the cyclodextrin-based porous template, the UV cross-linked materials with a 5 wt. % volatile solvent exhibited well-defined nanoscale patterns. Based on this study, acceptable chemistries for the UV cross-linked materials have been expanded, which will be beneficial for future device applications using UV nanoimprint lithography.

  7. Development of an advanced photovoltaic concentrator system for space applications

    NASA Technical Reports Server (NTRS)

    Piszczor, Michael F., Jr.; O'Neill, Mark J.

    1987-01-01

    Recent studies indicate that significant increases in system performance (increased efficiency and reduced system mass) are possible for high power space based systems by incorporating technological developments with photovoltaic power systems. The Advanced Photovoltaic Concentrator Program is an effort to take advantage of recent advancements in refractive optical elements. By using a domed Fresnel lens concentrator and a prismatic cell cover, to eliminate metallization losses, dramatic reductions in the required area and mass over current space photovoltaic systems are possible. The advanced concentrator concept also has significant advantages when compared to solar dynamic Organic Rankine Cycle power systems in Low Earth Orbit applications where energy storage is required. The program is currently involved in the selection of a material for the optical element that will survive the space environment and a demonstration of the system performance of the panel design.

  8. Mask lithography for display manufacturing

    NASA Astrophysics Data System (ADS)

    Sandstrom, T.; Ekberg, P.

    2010-05-01

    The last ten years have seen flat displays conquer our briefcases, desktops, and living rooms. There has been an enormous development in production technology, not least in lithography and photomasks. Current masks for large displays are more than 2 m2 and make 4-6 1X prints on glass substrates that are 9 m2. One of the most challenging aspects of photomasks for displays is the so called mura, stripes or blemishes which cause visible defects in the finished display. For the future new and even tighter maskwriter specifications are driven by faster transistors and more complex pixel layouts made necessary by the market's wish for still better image quality, multi-touch panels, 3D TVs, and the next wave of e-book readers. Large OLED screens will pose new challenges. Many new types of displays will be lowcost and use simple lithography, but anything which can show video and high quality photographic images needs a transistor backplane and sophisticated masks for its production.

  9. A combined electron beam/optical lithography process step for the fabrication of sub-half-micron-gate-length MMIC chips

    NASA Technical Reports Server (NTRS)

    Sewell, James S.; Bozada, Christopher A.

    1994-01-01

    Advanced radar and communication systems rely heavily on state-of-the-art microelectronics. Systems such as the phased-array radar require many transmit/receive (T/R) modules which are made up of many millimeter wave - microwave integrated circuits (MMIC's). The heart of a MMIC chip is the Gallium Arsenide (GaAs) field-effect transistor (FET). The transistor gate length is the critical feature that determines the operating frequency of the radar system. A smaller gate length will typically result in a higher frequency. In order to make a phased array radar system economically feasible, manufacturers must be capable of producing very large quantities of small-gate-length MMIC chips at a relatively low cost per chip. This requires the processing of a large number of wafers with a large number of chips per wafer, minimum processing time, and a very high chip yield. One of the bottlenecks in the fabrication of MIMIC chips is the transistor gate definition. The definition of sub-half-micron gates for GaAs-based field-effect transistors is generally performed by direct-write electron beam lithography (EBL). Because of the throughput limitations of EBL, the gate-layer fabrication is conventionally divided into two lithographic processes where EBL is used to generate the gate fingers and optical lithography is used to generate the large-area gate pads and interconnects. As a result, two complete sequences of resist application, exposure, development, metallization and lift-off are required for the entire gate structure. We have baselined a hybrid process, referred to as EBOL (electron beam/optical lithography), in which a single application of a multi-level resist is used for both exposures. The entire gate structure, (gate fingers, interconnects and pads), is then formed with a single metallization and lift-off process. The EBOL process thus retains the advantages of the high-resolution E-beam lithography and the high throughput of optical lithography while essentially

  10. Amphiphile nanoarchitectonics: from basic physical chemistry to advanced applications.

    PubMed

    Ramanathan, Muruganathan; Shrestha, Lok Kumar; Mori, Taizo; Ji, Qingmin; Hill, Jonathan P; Ariga, Katsuhiko

    2013-07-14

    Amphiphiles, either synthetic or natural, are structurally simple molecules with the unprecedented capacity to self-assemble into complex, hierarchical geometries in nanospace. Effective self-assembly processes of amphiphiles are often used to mimic biological systems, such as assembly of lipids and proteins, which has paved a way for bottom-up nanotechnology with bio-like advanced functions. Recent developments in nanostructure formation combine simple processes of assembly with the more advanced concept of nanoarchitectonics. In this perspective, we summarize research on self-assembly of amphiphilic molecules such as lipids, surfactants or block copolymers that are a focus of interest for many colloid, polymer, and materials scientists and which have become increasingly important in emerging nanotechnology and practical applications, latter of which are often accomplished by amphiphile-like polymers. Because the fundamental science of amphiphiles was initially developed for their solution assembly then transferred to assemblies on surfaces as a development of nanotechnological techniques, this perspective attempts to mirror this development by introducing solution systems and progressing to interfacial systems, which are roughly categorized as (i) basic properties of amphiphiles, (ii) self-assembly of amphiphiles in bulk phases, (iii) assembly on static surfaces, (iv) assembly at dynamic interfaces, and (v) advanced topics from simulation to application. This progression also represents the evolution of amphiphile science and technology from simple assemblies to advanced assemblies to nanoarchitectonics.

  11. Nanostructured Materials For Advanced Technological Applications: A Brief Introduction

    NASA Astrophysics Data System (ADS)

    Kulisch, W.; Freudenstein, R.; Ruiz, A.; Valsesia, A.; Sirghi, L.; Ponti, J.; Colpo, P.; Rossi, F.

    In this contribution a short introduction to nanostructured materials for advanced technological applications is presented. A major aim is to demonstrate, on the one hand, the diversity of approaches, methods, techniques and solutions, which are used currently worldwide — but also by the authors of the contributions collected in this book — in the field of nano-structured materials, but also that, on the other hand, these diverse topics are based on the same principles, face similar problems, and bear similar prospects for future applications. For this reason, frequent reference is made to the contributions to this book. Some examples to illustrate current topics, advances and problems are taken from the recent work of the present home institute of the author, the NanoBioTech group of the IHCP at the JRC.

  12. Recent Advances in Bioprinting and Applications for Biosensing

    PubMed Central

    Dias, Andrew D.; Kingsley, David M.; Corr, David T.

    2014-01-01

    Future biosensing applications will require high performance, including real-time monitoring of physiological events, incorporation of biosensors into feedback-based devices, detection of toxins, and advanced diagnostics. Such functionality will necessitate biosensors with increased sensitivity, specificity, and throughput, as well as the ability to simultaneously detect multiple analytes. While these demands have yet to be fully realized, recent advances in biofabrication may allow sensors to achieve the high spatial sensitivity required, and bring us closer to achieving devices with these capabilities. To this end, we review recent advances in biofabrication techniques that may enable cutting-edge biosensors. In particular, we focus on bioprinting techniques (e.g., microcontact printing, inkjet printing, and laser direct-write) that may prove pivotal to biosensor fabrication and scaling. Recent biosensors have employed these fabrication techniques with success, and further development may enable higher performance, including multiplexing multiple analytes or cell types within a single biosensor. We also review recent advances in 3D bioprinting, and explore their potential to create biosensors with live cells encapsulated in 3D microenvironments. Such advances in biofabrication will expand biosensor utility and availability, with impact realized in many interdisciplinary fields, as well as in the clinic. PMID:25587413

  13. Advanced stress analysis methods applicable to turbine engine structures

    NASA Technical Reports Server (NTRS)

    Pian, T. H. H.

    1985-01-01

    Advanced stress analysis methods applicable to turbine engine structures are investigated. Constructions of special elements which containing traction-free circular boundaries are investigated. New versions of mixed variational principle and version of hybrid stress elements are formulated. A method is established for suppression of kinematic deformation modes. semiLoof plate and shell elements are constructed by assumed stress hybrid method. An elastic-plastic analysis is conducted by viscoplasticity theory using the mechanical subelement model.

  14. Recent advances in carbon nanodots: synthesis, properties and biomedical applications

    NASA Astrophysics Data System (ADS)

    Miao, Peng; Han, Kun; Tang, Yuguo; Wang, Bidou; Lin, Tao; Cheng, Wenbo

    2015-01-01

    Herein, a mini review is presented concerning the most recent research progress of carbon nanodots, which have emerged as one of the most attractive photoluminescent materials. Different synthetic methodologies to achieve advanced functions and better photoluminescence performances are summarized, which are mainly divided into two classes: top-down and bottom-up. The inspiring properties, including photoluminescence emission, chemiluminescence, electrochemical luminescence, peroxidase-like activity and toxicity, are discussed. Moreover, the biomedical applications in biosensing, bioimaging and drug delivery are reviewed.

  15. Continuously variable transmission: Assessment of applicability to advance electric vehicles

    NASA Technical Reports Server (NTRS)

    Loewenthal, S. H.; Parker, R. J.

    1981-01-01

    A brief historical account of the evolution of continuously variable transmissions (CVT) for automotive use is given. The CVT concepts which are potentially suitable for application with electric and hybrid vehicles are discussed. The arrangement and function of several CVT concepts are cited along with their current developmental status. The results of preliminary design studies conducted on four CVT concepts for use in advanced electric vehicles are discussed.

  16. Natural polyphenols based new therapeutic avenues for advanced biomedical applications.

    PubMed

    Agrawal, Megha

    2015-01-01

    Polyphenols are naturally occurring, synthetic or semisynthetic organic compounds that offer a vast array of advanced biomedical applications. The mostly researched polyphenolic compounds are resveratrol and flavanols, notably (-)-epicatechin. The ongoing research on clinically important resveratrol and flavanols has revealed their potentials as extremely efficient drug agents that can be leveraged for new therapeutic designs for combating stroke related injuries, cancer and renal failures. Here, we have highlighted recent developments in this area with an emphasis on the biomedical applications of polyphenols. Also, a perspective on the future research directions has been discussed. We believe that this review would facilitate further research and development of polyphenols as a therapeutic avenue in medical science.

  17. Survey of advanced nuclear technologies for potential applications of sonoprocessing.

    PubMed

    Rubio, Floren; Blandford, Edward D; Bond, Leonard J

    2016-09-01

    Ultrasonics has been used in many industrial applications for both sensing at low power and processing at higher power. Generally, the high power applications fall within the categories of liquid stream degassing, impurity separation, and sonochemical enhancement of chemical processes. Examples of such industrial applications include metal production, food processing, chemical production, and pharmaceutical production. There are many nuclear process streams that have similar physical and chemical processes to those applications listed above. These nuclear processes could potentially benefit from the use of high-power ultrasonics. There are also potential benefits to applying these techniques in advanced nuclear fuel cycle processes, and these benefits have not been fully investigated. Currently the dominant use of ultrasonic technology in the nuclear industry has been using low power ultrasonics for non-destructive testing/evaluation (NDT/NDE), where it is primarily used for inspections and for characterizing material degradation. Because there has been very little consideration given to how sonoprocessing can potentially improve efficiency and add value to important process streams throughout the nuclear fuel cycle, there are numerous opportunities for improvement in current and future nuclear technologies. In this paper, the relevant fundamental theory underlying sonoprocessing is highlighted, and some potential applications to advanced nuclear technologies throughout the nuclear fuel cycle are discussed. PMID:27400217

  18. Survey of advanced nuclear technologies for potential applications of sonoprocessing.

    PubMed

    Rubio, Floren; Blandford, Edward D; Bond, Leonard J

    2016-09-01

    Ultrasonics has been used in many industrial applications for both sensing at low power and processing at higher power. Generally, the high power applications fall within the categories of liquid stream degassing, impurity separation, and sonochemical enhancement of chemical processes. Examples of such industrial applications include metal production, food processing, chemical production, and pharmaceutical production. There are many nuclear process streams that have similar physical and chemical processes to those applications listed above. These nuclear processes could potentially benefit from the use of high-power ultrasonics. There are also potential benefits to applying these techniques in advanced nuclear fuel cycle processes, and these benefits have not been fully investigated. Currently the dominant use of ultrasonic technology in the nuclear industry has been using low power ultrasonics for non-destructive testing/evaluation (NDT/NDE), where it is primarily used for inspections and for characterizing material degradation. Because there has been very little consideration given to how sonoprocessing can potentially improve efficiency and add value to important process streams throughout the nuclear fuel cycle, there are numerous opportunities for improvement in current and future nuclear technologies. In this paper, the relevant fundamental theory underlying sonoprocessing is highlighted, and some potential applications to advanced nuclear technologies throughout the nuclear fuel cycle are discussed.

  19. Advances in the manufacturing, types, and applications of biosensors

    NASA Astrophysics Data System (ADS)

    Ravindra, Nuggehalli M.; Prodan, Camelia; Fnu, Shanmugamurthy; Padronl, Ivan; Sikha, Sushil K.

    2007-12-01

    In recent years, there have been significant technological advancements in the manufacturing, types, and applications of biosensors. Applications include clinical and non-clinical diagnostics for home, bio-defense, bio-remediation, environment, agriculture, and the food industry. Biosensors have progressed beyond the detection of biological threats such as anthrax and are finding use in a number of non-biological applications. Emerging biosensor technologies such as lab-on-a-chip have revolutionized the integration approaches for a very flexible, innovative, and user-friendly platform. An overview of the fundamentals, types, applications, and manufacturers, as well as the market trends of biosensors is presented here. Two case studies are discussed: one focused on a characterization technique—patch clamping and dielectric spectroscopy as a biological sensor—and the other about lithium phthalocyanine, a material that is being developed for in-vivo oxymetry.

  20. Recent advances in research applications of nanophase hydroxyapatite.

    PubMed

    Fox, Kate; Tran, Phong A; Tran, Nhiem

    2012-07-16

    Hydroxyapatite, the main inorganic material in natural bone, has been used widely for orthopaedic applications. Due to size effects and surface phenomena at the nanoscale, nanophase hydroxyapatite possesses unique properties compared to its bulk-phase counterpart. The high surface-to-volume ratio, reactivities, and biomimetic morphologies make nano-hydroxyapatite more favourable in applications such as orthopaedic implant coating or bone substitute filler. Recently, more efforts have been focused on the possibility of combining hydroxyapatite with other drugs and materials for multipurpose applications, such as antimicrobial treatments, osteoporosis treatments and magnetic manipulation. To build more effective nano-hydroxyapatite and composite systems, the particle synthesis processes, chemistry, and toxicity have to be thoroughly investigated. In this Minireview, we report the recent advances in research regarding nano-hydroxyapatite. Synthesis routes and a wide range of applications of hydroxyapatite nanoparticles will be discussed. The Minireview also addresses several challenges concerning the biosafety of the nanoparticles.

  1. Optimization of X-ray sources from a high-average-power ND:Glass laser-produced plasma for proximity lithography

    SciTech Connect

    Celliers, P.; Da Silva, L.B.; Dane, C.B.

    1996-06-01

    The concept of a laser-based proximity lithography system for electronic microcircuit production has advanced to the point where a detailed design of a prototype system capable of exposing wafers at 40 wafer levels per hr is technically feasible with high-average-power laser technology. In proximity x-ray lithography, a photoresist composed of polymethyl- methacrylate (PMMA) or similar material is exposed to x rays transmitted through a mask placed near the photoresist, a procedure which is similar to making a photographic contact print. The mask contains a pattern of opaque metal features, with line widths as small as 0.12 {mu}m, placed on a thin (1-{mu}m thick) Si membrane. During the exposure, the shadow of the mask projected onto the resist produces in the physical and chemical properties of the resist a pattern of variation with the same size and shape as the features contained in the metal mask. This pattern can be further processed to produce microscopic structures in the Si substrate. The main application envisioned for this technology is the production of electronic microcircuits with spatial features significantly smaller than currently achievable with conventional optical lithographic techniques (0.12 {micro}m vs 0.25 {micro}m). This article describes work on optimizing a laser-produced plasma x-ray source intended for microcircuit production by proximity lithography.

  2. Fabricating Blazed Diffraction Gratings by X-Ray Lithography

    NASA Technical Reports Server (NTRS)

    Mouroulis, Pantazis; Hartley, Frank; Wilson, Daniel

    2004-01-01

    Gray-scale x-ray lithography is undergoing development as a technique for fabricating blazed diffraction gratings. As such, gray-scale x-ray lithography now complements such other grating-fabrication techniques as mechanical ruling, holography, ion etching, laser ablation, laser writing, and electron-beam lithography. Each of these techniques offers advantages and disadvantages for implementing specific grating designs; no single one of these techniques can satisfy the design requirements for all applications. Gray-scale x-ray lithography is expected to be advantageous for making gratings on steeper substrates than those that can be made by electron-beam lithography. This technique is not limited to sawtooth groove profiles and flat substrates: various groove profiles can be generated on arbitrarily shaped (including highly curved) substrates with the same ease as sawtooth profiles can be generated on flat substrates. Moreover, the gratings fabricated by this technique can be made free of ghosts (spurious diffraction components attributable to small spurious periodicities in the locations of grooves). The first step in gray-scale x-ray lithography is to conformally coat a substrate with a suitable photoresist. An x-ray mask (see Figure 1) is generated, placed between the substrate and a source of collimated x-rays, and scanned over the substrate so as to create a spatial modulation in the exposure of the photoresist. Development of the exposed photoresist results in a surface corrugation that corresponds to the spatial modulation and that defines the grating surface. The grating pattern is generated by scanning an appropriately shaped x-ray area mask along the substrate. The mask example of Figure 1 would generate a blazed grating profile when scanned in the perpendicular direction at constant speed, assuming the photoresist responds linearly to incident radiation. If the resist response is nonlinear, then the mask shape can be modified to account for the

  3. Smartphone sensors for stone lithography authentication.

    PubMed

    Spagnolo, Giuseppe Schirripa; Cozzella, Lorenzo; Papalillo, Donato

    2014-01-01

    Nowadays mobile phones include quality photo and video cameras, access to wireless networks and the internet, GPS assistance and other innovative systems. These facilities open them to innovative uses, other than the classical telephonic communication one. Smartphones are a more sophisticated version of classic mobile phones, which have advanced computing power, memory and connectivity. Because fake lithographs are flooding the art market, in this work, we propose a smartphone as simple, robust and efficient sensor for lithograph authentication. When we buy an artwork object, the seller issues a certificate of authenticity, which contains specific details about the artwork itself. Unscrupulous sellers can duplicate the classic certificates of authenticity, and then use them to "authenticate" non-genuine works of art. In this way, the buyer will have a copy of an original certificate to attest that the "not original artwork" is an original one. A solution for this problem would be to insert a system that links together the certificate and the related specific artwork. To do this it is necessary, for a single artwork, to find unique, unrepeatable, and unchangeable characteristics. In this article we propose an innovative method for the authentication of stone lithographs. We use the color spots distribution captured by means of a smartphone camera as a non-cloneable texture of the specific artworks and an information management system for verifying it in mobility stone lithography. PMID:24811077

  4. Smartphone Sensors for Stone Lithography Authentication

    PubMed Central

    Schirripa Spagnolo, Giuseppe; Cozzella, Lorenzo; Papalillo, Donato

    2014-01-01

    Nowadays mobile phones include quality photo and video cameras, access to wireless networks and the internet, GPS assistance and other innovative systems. These facilities open them to innovative uses, other than the classical telephonic communication one. Smartphones are a more sophisticated version of classic mobile phones, which have advanced computing power, memory and connectivity. Because fake lithographs are flooding the art market, in this work, we propose a smartphone as simple, robust and efficient sensor for lithograph authentication. When we buy an artwork object, the seller issues a certificate of authenticity, which contains specific details about the artwork itself. Unscrupulous sellers can duplicate the classic certificates of authenticity, and then use them to “authenticate” non-genuine works of art. In this way, the buyer will have a copy of an original certificate to attest that the “not original artwork” is an original one. A solution for this problem would be to insert a system that links together the certificate and the related specific artwork. To do this it is necessary, for a single artwork, to find unique, unrepeatable, and unchangeable characteristics. In this article we propose an innovative method for the authentication of stone lithographs. We use the color spots distribution captured by means of a smartphone camera as a non-cloneable texture of the specific artworks and an information management system for verifying it in mobility stone lithography. PMID:24811077

  5. Applications and Advances in Electronic-Nose Technologies

    PubMed Central

    Wilson, Alphus D.; Baietto, Manuela

    2009-01-01

    Electronic-nose devices have received considerable attention in the field of sensor technology during the past twenty years, largely due to the discovery of numerous applications derived from research in diverse fields of applied sciences. Recent applications of electronic nose technologies have come through advances in sensor design, material improvements, software innovations and progress in microcircuitry design and systems integration. The invention of many new e-nose sensor types and arrays, based on different detection principles and mechanisms, is closely correlated with the expansion of new applications. Electronic noses have provided a plethora of benefits to a variety of commercial industries, including the agricultural, biomedical, cosmetics, environmental, food, manufacturing, military, pharmaceutical, regulatory, and various scientific research fields. Advances have improved product attributes, uniformity, and consistency as a result of increases in quality control capabilities afforded by electronic-nose monitoring of all phases of industrial manufacturing processes. This paper is a review of the major electronic-nose technologies, developed since this specialized field was born and became prominent in the mid 1980s, and a summarization of some of the more important and useful applications that have been of greatest benefit to man. PMID:22346690

  6. Feature-based tolerancing for advanced manufacturing applications

    SciTech Connect

    Brown, C.W.; Kirk, W.J. III; Simons, W.R.; Ward, R.C.; Brooks, S.L.

    1994-11-01

    A primary requirement for the successful deployment of advanced manufacturing applications is the need for a complete and accessible definition of the product. This product definition must not only provide an unambiguous description of a product`s nominal shape but must also contain complete tolerance specification and general property attributes. Likewise, the product definition`s geometry, topology, tolerance data, and modeler manipulative routines must be fully accessible through a robust application programmer interface. This paper describes a tolerancing capability using features that complements a geometric solid model with a representation of conventional and geometric tolerances and non-shape property attributes. This capability guarantees a complete and unambiguous definition of tolerances for manufacturing applications. An object-oriented analysis and design of the feature-based tolerance domain was performed. The design represents and relates tolerance features, tolerances, and datum reference frames. The design also incorporates operations that verify correctness and check for the completeness of the overall tolerance definition. The checking algorithm is based upon the notion of satisfying all of a feature`s toleranceable aspects. Benefits from the feature-based tolerance modeler include: advancing complete product definition initiatives, incorporating tolerances in product data exchange, and supplying computer-integrated manufacturing applications with tolerance information.

  7. Large area direct-write focused ion-beam lithography with dual-beam microscope.

    SciTech Connect

    Imre-Joshi, A.; Ocola, L. E.; Rich, L.; Klingfus, J.

    2010-03-01

    The authors have investigated the performance of focused ion-beam (FIB) direct-write lithography for large area (multiple write-field) patterning in an FEI Nova Nanolab 600 dual-beam microscope. Their system is configured with a 100 nm resolution X-Y stage and a RAITH ELPHY LITHOGRAPHY control interface, with its own integrated 16 bit DAC pattern generator and software. Key issues with regard to configuration, process parameters, and procedures have been addressed. Characterization of stitching errors, pattern repeatability, and drift were performed. Offset lithography (multiple exposures with offset write fields) and in-field registration marks were evaluated for correcting stitching errors, and a test microfluidic device covering an area of 1 x 1.4 mm{sup 2} was successfully fabricated. The authors found that by using a combination of offset lithography and in-field registration mark correction methods, the stitching errors can be kept well below 100 nm. They also found that due to higher beam deflection speed provided by the electrostatic scanning in FIB systems versus the wide-spread electron-beam systems with electromagnetic scanning, FIB lithography can be just as fast as electron-beam lithography for typical mill depths down to about 200-500 nm (material dependent). This opens the door for a large suite of applications for materials where pattern transfer is difficult or impossible by reactive methods.

  8. Amphiphile nanoarchitectonics: from basic physical chemistry to advanced applications

    SciTech Connect

    Ramanathan, Nathan Muruganathan; Shrestha, Lok Kumar; Mori, Taizo; Ji, Dr. Qingmin; Hill, Dr. Jonathan P; Ariga, Katsuhiko

    2013-01-01

    Amphiphiles, either synthetic or natural, are structurally simple molecules with the unprecedented capacity to self-assemble into complex, hierarchical geometries in nanospace. Effective self-assembly processes of amphiphiles are often used to mimic biological systems, such as, assembly of lipids and proteins, which has paved a way for bottom-up nanotechnology with bio-like advanced functions. Recent developments on nanostructure formation combine simple processes of assembly with the more advanced concept of nanoarchitectonics. In this pespective, we summarize research on self-assembly of amphiphilic molecules such as lipids, surfactants or block copolymers that are a focus of interest for many colloid, polymer, and materials scientists and which have become increasingly important in emerging nanotechnology. Because the fundamental science of amphiphiles was initially developed for their solution assembly then transferred to assemblies on surfaces as a development of nanotechnological technique, this perspective attempts to mirro this development by introducing solution systems and progressing to interfacial systems, which are roughly categorized as (i) basic properties of amphiphiles, (ii) self-assembly of amphiphiles in bulk phases, (iii) assembly on static surfaces, (iv) assembly at dynamic interfaces, and (v) advanced topics from simulation to application. This progression also represents the evolution of amphiphile science and technology from simple assemblies to advanced assemblies to nanoarchitectonics.

  9. Design Advances in Particulate Systems for Biomedical Applications.

    PubMed

    Lima, Ana Catarina; Alvarez-Lorenzo, Carmen; Mano, João F

    2016-07-01

    The search for more efficient therapeutic strategies and diagnosis tools is a continuous challenge. Advances in understanding the biological mechanisms behind diseases and tissues regeneration have widened the field of applications of particulate systems. Particles are no more just protective systems for the encapsulated drugs, but they play an active role in the success of the therapy. Moreover, particles have been explored for innovative purposes as templates for cells growth and as diagnostic tools. Until few years ago the most relevant parameters in particles formulation were the chemistry and the size. Currently, it is known that other physical characteristics can remarkably affect the performance of particulate systems. Particles with non-conventional shapes exhibit advantages due to the increasing circulation time in blood stream, less clearance by the immune system and more efficient cell internalization and trafficking. Creation of compartments has been found useful to control drug release, to tune the transport of substances across biological barriers, to supply the target with more than one bioactive agent or even to act as theranostic systems. It is expected that such complex shaped and compartmentalized systems improve the therapeutic outcomes and also the patient's compliance, acting as advanced devices that serve for simultaneous diagnosis and treatment of the disease, combining agents of very different features, at the same time. In this review, we overview and analyse the most recent advances in particle shape and compartmentalization and applications of newly designed particulate systems in the biomedical field.

  10. Nanoscience and Nanotechnology: From Energy Applications to Advanced Medical Therapies

    ScienceCinema

    Tijana Rajh

    2016-07-12

    Dr. Rajh will present a general talk on nanotechnology – an overview of why nanotechnology is important and how it is useful in various fields. The specific focus will be on Solar energy conversion, environmental applications and advanced medical therapies. She has broad expertise in synthesis and characterization of nanomaterials that are used in nanotechnology including novel hybrid systems connecting semiconductors to biological molecules like DNA and antibodies. This technology could lead to new gene therapy procedures, cancer treatments and other medical applications. She will also discuss technologies made possible by organizing small semiconductor particles called quantum dots, materials that exhibit a rich variety of phenomena that are size and shape dependent. Development of these new materials that harnesses the unique properties of materials at the 1-100 nanometer scale resulted in the new field of nanotechnology that currently affects many applications in technological and medical fields.

  11. Practical constraints on sources for pulsed beam lithographies

    SciTech Connect

    Tsao, J.Y.; Picraux, S.T.; Light, R.W.; Hsing, W.W.

    1988-03-01

    Many of the sources currently being considered for advanced microlithography are pulsed, rather than continuous. These sources are characterized not merely by brightness and lifetime, but more generally by shot-to-shot stability, lifetime, single-pulse fluence, and repetition rate. These four characteristics are constrained by practical considerations, and, within limits, can be traded off against each other. We describe these tradeoffs and optimal source operating regimes for lithographies based on broad- and narrow-band excimer laser sources and on pulsed x-ray sources. 18 refs., 2 figs.

  12. Image-projection ion-beam lithography

    SciTech Connect

    Miller, P.A.

    1989-01-01

    Image-projection ion-beam lithography promises high-throughput patterning with wide process latitude, excellent resolution, and minimal damage to underlying circuit layers. The process involves extracting helium ions from a plasma source, transmitting the ions at low voltage through a stencil reticle, and then accelerating and focusing the ions electrostatically onto the wafer. A key feature is the use of image demagnification which simplifies reticle fabrication and inspection, and leads to low power loading on the reticle and long reticle life. In this paper we report computational studies aimed at improving field size, linearity, and telecentricity over that demonstrated experimentally in the pioneering work by Ion Microfabrication Systems, GmbH (Vienna) during the past decade. We study a mechanically simple arrangement of equal-radii coaxial tubular lenses. We employ ion column optimization by simulated annealing and uncover a new optimization strategy which may be applicable in other optimization work. The resulting column design is much improved over our initial attempts based on an iterative optimization procedure. However, we still are unable to eliminate image distortion, and we would need either to rely on reticle predistortion or on use of a more complex electrode system for a production application. 15 refs., 5 figs.

  13. Advances in Electronic-Nose Technologies Developed for Biomedical Applications

    PubMed Central

    Wilson, Alphus D.; Baietto, Manuela

    2011-01-01

    The research and development of new electronic-nose applications in the biomedical field has accelerated at a phenomenal rate over the past 25 years. Many innovative e-nose technologies have provided solutions and applications to a wide variety of complex biomedical and healthcare problems. The purposes of this review are to present a comprehensive analysis of past and recent biomedical research findings and developments of electronic-nose sensor technologies, and to identify current and future potential e-nose applications that will continue to advance the effectiveness and efficiency of biomedical treatments and healthcare services for many years. An abundance of electronic-nose applications has been developed for a variety of healthcare sectors including diagnostics, immunology, pathology, patient recovery, pharmacology, physical therapy, physiology, preventative medicine, remote healthcare, and wound and graft healing. Specific biomedical e-nose applications range from uses in biochemical testing, blood-compatibility evaluations, disease diagnoses, and drug delivery to monitoring of metabolic levels, organ dysfunctions, and patient conditions through telemedicine. This paper summarizes the major electronic-nose technologies developed for healthcare and biomedical applications since the late 1980s when electronic aroma detection technologies were first recognized to be potentially useful in providing effective solutions to problems in the healthcare industry. PMID:22346620

  14. Gold Nanoparticles: Recent Advances in the Biomedical Applications.

    PubMed

    Zhang, Xiaoying

    2015-07-01

    Among the multiple branches of nanotechnology applications in the area of medicine and biology, Nanoparticle technology is the fastest growing and shows significant future promise. Nanoscale structures, with size similar to many biological molecules, show different physical and chemical properties compared to either small molecules or bulk materials, find many applications in the fields of biomedical imaging and therapy. Gold nanoparticles (AuNPs) are relatively inert in biological environment, and have a number of physical properties that are suitable for several biomedical applications. For example, AuNPs have been successfully employed in inducing localized hyperthermia for the destruction of tumors or radiotherapy for cancer, photodynamic therapy, computed tomography imaging, as drug carriers to tumors, bio-labeling through single particle detection by electron microscopy and in photothermal microscopy. Recent advances in synthetic chemistry makes it possible to make gold nanoparticles with precise control over physicochemical and optical properties that are desired for specific clinical or biological applications. Because of the availability of several methods for easy modification of the surface of gold nanoparticles for attaching a ligand, drug or other targeting molecules, AuNPs are useful in a wide variety of applications. Even though gold is biologically inert and thus shows much less toxicity, the relatively low rate of clearance from circulation and tissues can lead to health problems and therefore, specific targeting of diseased cells and tissues must be achieved before AuNPs find their application for routine human use.

  15. Nanoscale Copper and Copper Compounds for Advanced Device Applications

    NASA Astrophysics Data System (ADS)

    Chen, Lih-Juann

    2016-04-01

    Copper has been in use for at least 10,000 years. Copper alloys, such as bronze and brass, have played important roles in advancing civilization in human history. Bronze artifacts date at least 6500 years. On the other hand, discovery of intriguing properties and new applications in contemporary technology for copper and its compounds, particularly on nanoscale, have continued. In this paper, examples for the applications of Cu and Cu alloys for advanced device applications will be given on Cu metallization in microelectronics devices, Cu nanobats as field emitters, Cu2S nanowire array as high-rate capability and high-capacity cathodes for lithium-ion batteries, Cu-Te nanostructures for field-effect transistor, Cu3Si nanowires as high-performance field emitters and efficient anti-reflective layers, single-crystal Cu(In,Ga)Se2 nanotip arrays for high-efficiency solar cell, multilevel Cu2S resistive memory, superlattice Cu2S-Ag2S heterojunction diodes, and facet-dependent Cu2O diode.

  16. Advances in targeted proteomics and applications to biomedical research

    PubMed Central

    Shi, Tujin; Song, Ehwang; Nie, Song; Rodland, Karin D.; Liu, Tao; Qian, Wei-Jun; Smith, Richard D.

    2016-01-01

    Targeted proteomics technique has emerged as a powerful protein quantification tool in systems biology, biomedical research, and increasing for clinical applications. The most widely used targeted proteomics approach, selected reaction monitoring (SRM), also known as multiple reaction monitoring (MRM), can be used for quantification of cellular signaling networks and preclinical verification of candidate protein biomarkers. As an extension to our previous review on advances in SRM sensitivity herein we review recent advances in the method and technology for further enhancing SRM sensitivity (from 2012 to present), and highlighting its broad biomedical applications in human bodily fluids, tissue and cell lines. Furthermore, we also review two recently introduced targeted proteomics approaches, parallel reaction monitoring (PRM) and data-independent acquisition (DIA) with targeted data extraction on fast scanning high-resolution accurate-mass (HR/AM) instruments. Such HR/AM targeted quantification with monitoring all target product ions addresses SRM limitations effectively in specificity and multiplexing; whereas when compared to SRM, PRM and DIA are still in the infancy with a limited number of applications. Thus, for HR/AM targeted quantification we focus our discussion on method development, data processing and analysis, and its advantages and limitations in targeted proteomics. Finally, general perspectives on the potential of achieving both high sensitivity and high sample throughput for large-scale quantification of hundreds of target proteins are discussed. PMID:27302376

  17. Thermal and Environmental Barrier Coatings for Advanced Turbine Engine Applications

    NASA Technical Reports Server (NTRS)

    Zhu, Dong-Ming; Miller, Robert A.

    2005-01-01

    Ceramic thermal and environmental barrier coatings (T/EBCs) will play a crucial role in advanced gas turbine engine systems because of their ability to significantly increase engine operating temperatures and reduce cooling requirements, thus help achieve engine low emission and high efficiency goals. Advanced T/EBCs are being developed for the low emission SiC/SiC ceramic matrix composite (CMC) combustor applications by extending the CMC liner and vane temperature capability to 1650 C (3000 F) in oxidizing and water vapor containing combustion environments. Low conductivity thermal barrier coatings (TBCs) are also being developed for metallic turbine airfoil and combustor applications, providing the component temperature capability up to 1650 C (3000 F). In this paper, ceramic coating development considerations and requirements for both the ceramic and metallic components will be described for engine high temperature and high-heat-flux applications. The underlying coating failure mechanisms and life prediction approaches will be discussed based on the simulated engine tests and fracture mechanics modeling results.

  18. Advances in targeted proteomics and applications to biomedical research.

    PubMed

    Shi, Tujin; Song, Ehwang; Nie, Song; Rodland, Karin D; Liu, Tao; Qian, Wei-Jun; Smith, Richard D

    2016-08-01

    Targeted proteomics technique has emerged as a powerful protein quantification tool in systems biology, biomedical research, and increasing for clinical applications. The most widely used targeted proteomics approach, selected reaction monitoring (SRM), also known as multiple reaction monitoring (MRM), can be used for quantification of cellular signaling networks and preclinical verification of candidate protein biomarkers. As an extension to our previous review on advances in SRM sensitivity (Shi et al., Proteomics, 12, 1074-1092, 2012) herein we review recent advances in the method and technology for further enhancing SRM sensitivity (from 2012 to present), and highlighting its broad biomedical applications in human bodily fluids, tissue and cell lines. Furthermore, we also review two recently introduced targeted proteomics approaches, parallel reaction monitoring (PRM) and data-independent acquisition (DIA) with targeted data extraction on fast scanning high-resolution accurate-mass (HR/AM) instruments. Such HR/AM targeted quantification with monitoring all target product ions addresses SRM limitations effectively in specificity and multiplexing; whereas when compared to SRM, PRM and DIA are still in the infancy with a limited number of applications. Thus, for HR/AM targeted quantification we focus our discussion on method development, data processing and analysis, and its advantages and limitations in targeted proteomics. Finally, general perspectives on the potential of achieving both high sensitivity and high sample throughput for large-scale quantification of hundreds of target proteins are discussed.

  19. Gradient-based inverse extreme ultraviolet lithography.

    PubMed

    Ma, Xu; Wang, Jie; Chen, Xuanbo; Li, Yanqiu; Arce, Gonzalo R

    2015-08-20

    Extreme ultraviolet (EUV) lithography is the most promising successor of current deep ultraviolet (DUV) lithography. The very short wavelength, reflective optics, and nontelecentric structure of EUV lithography systems bring in different imaging phenomena into the lithographic image synthesis problem. This paper develops a gradient-based inverse algorithm for EUV lithography systems to effectively improve the image fidelity by comprehensively compensating the optical proximity effect, flare, photoresist, and mask shadowing effects. A block-based method is applied to iteratively optimize the main features and subresolution assist features (SRAFs) of mask patterns, while simultaneously preserving the mask manufacturability. The mask shadowing effect may be compensated by a retargeting method based on a calibrated shadowing model. Illustrative simulations at 22 and 16 nm technology nodes are presented to validate the effectiveness of the proposed methods. PMID:26368764

  20. 32 nm logic patterning options with immersion lithography

    NASA Astrophysics Data System (ADS)

    Lai, K.; Burns, S.; Halle, S.; Zhuang, L.; Colburn, M.; Allen, S.; Babcock, C.; Baum, Z.; Burkhardt, M.; Dai, V.; Dunn, D.; Geiss, E.; Haffner, H.; Han, G.; Lawson, P.; Mansfield, S.; Meiring, J.; Morgenfeld, B.; Tabery, C.; Zou, Y.; Sarma, C.; Tsou, L.; Yan, W.; Zhuang, H.; Gil, D.; Medeiros, D.

    2008-03-01

    The semiconductor industry faces a lithographic scaling limit as the industry completes the transition to 1.35 NA immersion lithography. Both high-index immersion lithography and EUV lithography are facing technical challenges and commercial timing issues. Consequently, the industry has focused on enabling double patterning technology (DPT) as a means to circumvent the limitations of Rayleigh scaling. Here, the IBM development alliance demonstrate a series of double patterning solutions that enable scaling of logic constructs by decoupling the pattern spatially through mask design or temporally through innovative processes. These techniques have been successfully employed for early 32nm node development using 45nm generation tooling. Four different double patterning techniques were implemented. The first process illustrates local RET optimization through the use of a split reticle design. In this approach, a layout is decomposed into a series of regions with similar imaging properties and the illumination conditions for each are independently optimized. These regions are then printed separately into the same resist film in a multiple exposure process. The result is a singly developed pattern that could not be printed with a single illumination-mask combination. The second approach addresses 2D imaging with particular focus on both line-end dimension and linewidth control [1]. A double exposure-double etch (DE2) approach is used in conjunction with a pitch-filling sacrificial feature strategy. The third double exposure process, optimized for via patterns also utilizes DE2. In this method, a design is split between two separate masks such that the minimum pitch between any two vias is larger than the minimum metal pitch. This allows for final structures with vias at pitches beyond the capability of a single exposure. In the fourth method,, dark field double dipole lithography (DDL) has been successfully applied to BEOL metal structures and has been shown to be

  1. Advanced stress analysis methods applicable to turbine engine structures

    NASA Technical Reports Server (NTRS)

    Pian, Theodore H. H.

    1991-01-01

    The following tasks on the study of advanced stress analysis methods applicable to turbine engine structures are described: (1) constructions of special elements which contain traction-free circular boundaries; (2) formulation of new version of mixed variational principles and new version of hybrid stress elements; (3) establishment of methods for suppression of kinematic deformation modes; (4) construction of semiLoof plate and shell elements by assumed stress hybrid method; and (5) elastic-plastic analysis by viscoplasticity theory using the mechanical subelement model.

  2. Application of scanning acoustic microscopy to advanced structural ceramics

    NASA Technical Reports Server (NTRS)

    Vary, Alex; Klima, Stanley J.

    1987-01-01

    A review is presentod of research investigations of several acoustic microscopy techniques for application to structural ceramics for advanced heat engines. Results obtained with scanning acoustic microscopy (SAM), scanning laser acoustic microscopy (SLAM), scanning electron acoustic microscopy (SEAM), and photoacoustic microscopy (PAM) are compared. The techniques were evaluated on research samples of green and sintered monolithic silicon nitrides and silicon carbides in the form of modulus-of-rupture bars containing deliberately introduced flaws. Strengths and limitations of the techniques are described with emphasis on statistics of detectability of flaws that constitute potential fracture origins.

  3. Advancing Risk Assessment through the Application of Systems Toxicology.

    PubMed

    Sauer, John Michael; Kleensang, André; Peitsch, Manuel C; Hayes, A Wallace

    2016-01-01

    Risk assessment is the process of quantifying the probability of a harmful effect to individuals or populations from human activities. Mechanistic approaches to risk assessment have been generally referred to as systems toxicology. Systems toxicology makes use of advanced analytical and computational tools to integrate classical toxicology and quantitative analysis of large networks of molecular and functional changes occurring across multiple levels of biological organization. Three presentations including two case studies involving both in vitro and in vivo approaches described the current state of systems toxicology and the potential for its future application in chemical risk assessment. PMID:26977253

  4. Advancing Risk Assessment through the Application of Systems Toxicology

    PubMed Central

    Sauer, John Michael; Kleensang, André; Peitsch, Manuel C.; Hayes, A. Wallace

    2016-01-01

    Risk assessment is the process of quantifying the probability of a harmful effect to individuals or populations from human activities. Mechanistic approaches to risk assessment have been generally referred to as systems toxicology. Systems toxicology makes use of advanced analytical and computational tools to integrate classical toxicology and quantitative analysis of large networks of molecular and functional changes occurring across multiple levels of biological organization. Three presentations including two case studies involving both in vitro and in vivo approaches described the current state of systems toxicology and the potential for its future application in chemical risk assessment. PMID:26977253

  5. Application of advanced coating techniques to rocket engine components

    NASA Technical Reports Server (NTRS)

    Verma, S. K.

    1988-01-01

    The materials problem in the space shuttle main engine (SSME) is reviewed. Potential coatings and the method of their application for improved life of SSME components are discussed. A number of advanced coatings for turbine blade components and disks are being developed and tested in a multispecimen thermal fatigue fluidized bed facility at IIT Research Institute. This facility is capable of producing severe strains of the degree present in blades and disk components of the SSME. The potential coating systems and current efforts at IITRI being taken for life extension of the SSME components are summarized.

  6. Applications of advanced transport aircraft in developing countries

    NASA Technical Reports Server (NTRS)

    Gobetz, F. W.; Assarabowski, R. J.; Leshane, A. A.

    1978-01-01

    Four representative market scenarios were studied to evaluate the relative performance of air-and surface-based transportation systems in meeting the needs of two developing contries, Brazil and Indonesia, which were selected for detailed case studies. The market scenarios were: remote mining, low-density transport, tropical forestry, and large cargo aircraft serving processing centers in resource-rich, remote areas. The long-term potential of various aircraft types, together with fleet requirements and necessary technology advances, is determined for each application.

  7. Nanoscale biomaterial interface modification for advanced tissue engineering applications

    NASA Astrophysics Data System (ADS)

    Safonov, V.; Zykova, A.; Smolik, J.; Rogovska, R.; Donkov, N.; Goltsev, A.; Dubrava, T.; Rassokha, I.; Georgieva, V.

    2012-03-01

    Recently, various stem cells, including mesenchymal stem cells (MSCs), have been found to have considerable potential for application in tissue engineering and future advanced therapies due to their biological capability to differentiate into specific lineages. Modified surface properties, such as composition, nano-roughness and wettability, affect the most important processes at the biomaterial interface. The aim of the present is work is to study the stem cells' (MSCs) adhesive potential, morphology, phenotypical characteristics in in vitro tests, and to distinguish betwen the different factors influencing the cell/biomaterial interaction, such as nano-topography, surface chemistry and surface free energy.

  8. Transcranial Doppler: Techniques and advanced applications: Part 2

    PubMed Central

    Sharma, Arvind K.; Bathala, Lokesh; Batra, Amit; Mehndiratta, Man Mohan; Sharma, Vijay K.

    2016-01-01

    Transcranial Doppler (TCD) is the only diagnostic tool that can provide continuous information about cerebral hemodynamics in real time and over extended periods. In the previous paper (Part 1), we have already presented the basic ultrasound physics pertaining to TCD, insonation methods, and various flow patterns. This article describes various advanced applications of TCD such as detection of right-to-left shunt, emboli monitoring, vasomotor reactivity (VMR), monitoring of vasospasm in subarachnoid hemorrhage (SAH), monitoring of intracranial pressure, its role in stoke prevention in sickle cell disease, and as a supplementary test for confirmation of brain death. PMID:27011639

  9. Chemical trimming overcoat: an enhancing composition and process for 193nm lithography

    NASA Astrophysics Data System (ADS)

    Liu, Cong; Rowell, Kevin; Joesten, Lori; Baranowski, Paul; Kaur, Irvinder; Huang, Wanyi; Leonard, JoAnne; Jeong, Hae-Mi; Im, Kwang-Hwyi; Estelle, Tom; Cutler, Charlotte; Pohlers, Gerd; Yin, Wenyan; Fallon, Patricia; Li, Mingqi; Jeon, Hyun; Xu, Cheng Bai; Trefonas, Pete

    2016-03-01

    As the critical dimension of devices is approaching the resolution limit of 193nm photo lithography, multiple patterning processes have been developed to print smaller CD and pitch. Multiple patterning and other advanced lithographic processes often require the formation of isolated features such as lines or posts by direct lithographic printing. The formation of isolated features with an acceptable process window, however, can pose a challenge as a result of poor aerial image contrast at defocus. Herein we report a novel Chemical Trimming Overcoat (CTO) as an extra step after lithography that allows us to achieve smaller feature size and better process window.

  10. Advances in polymeric systems for tissue engineering and biomedical applications.

    PubMed

    Ravichandran, Rajeswari; Sundarrajan, Subramanian; Venugopal, Jayarama Reddy; Mukherjee, Shayanti; Ramakrishna, Seeram

    2012-03-01

    The characteristics of tissue engineered scaffolds are major concerns in the quest to fabricate ideal scaffolds for tissue engineering applications. The polymer scaffolds employed for tissue engineering applications should possess multifunctional properties such as biocompatibility, biodegradability and favorable mechanical properties as it comes in direct contact with the body fluids in vivo. Additionally, the polymer system should also possess biomimetic architecture and should support stem cell adhesion, proliferation and differentiation. As the progress in polymer technology continues, polymeric biomaterials have taken characteristics more closely related to that desired for tissue engineering and clinical needs. Stimuli responsive polymers also termed as smart biomaterials respond to stimuli such as pH, temperature, enzyme, antigen, glucose and electrical stimuli that are inherently present in living systems. This review highlights the exciting advancements in these polymeric systems that relate to biological and tissue engineering applications. Additionally, several aspects of technology namely scaffold fabrication methods and surface modifications to confer biological functionality to the polymers have also been discussed. The ultimate objective is to emphasize on these underutilized adaptive behaviors of the polymers so that novel applications and new generations of smart polymeric materials can be realized for biomedical and tissue engineering applications.

  11. Recent advances in application of biosensors in tissue engineering.

    PubMed

    Hasan, Anwarul; Nurunnabi, Md; Morshed, Mahboob; Paul, Arghya; Polini, Alessandro; Kuila, Tapas; Al Hariri, Moustafa; Lee, Yong-kyu; Jaffa, Ayad A

    2014-01-01

    Biosensors research is a fast growing field in which tens of thousands of papers have been published over the years, and the industry is now worth billions of dollars. The biosensor products have found their applications in numerous industries including food and beverages, agricultural, environmental, medical diagnostics, and pharmaceutical industries and many more. Even though numerous biosensors have been developed for detection of proteins, peptides, enzymes, and numerous other biomolecules for diverse applications, their applications in tissue engineering have remained limited. In recent years, there has been a growing interest in application of novel biosensors in cell culture and tissue engineering, for example, real-time detection of small molecules such as glucose, lactose, and H2O2 as well as serum proteins of large molecular size, such as albumin and alpha-fetoprotein, and inflammatory cytokines, such as IFN-g and TNF-α. In this review, we provide an overview of the recent advancements in biosensors for tissue engineering applications. PMID:25165697

  12. Recent Advances in Application of Biosensors in Tissue Engineering

    PubMed Central

    Paul, Arghya; Lee, Yong-kyu; Jaffa, Ayad A.

    2014-01-01

    Biosensors research is a fast growing field in which tens of thousands of papers have been published over the years, and the industry is now worth billions of dollars. The biosensor products have found their applications in numerous industries including food and beverages, agricultural, environmental, medical diagnostics, and pharmaceutical industries and many more. Even though numerous biosensors have been developed for detection of proteins, peptides, enzymes, and numerous other biomolecules for diverse applications, their applications in tissue engineering have remained limited. In recent years, there has been a growing interest in application of novel biosensors in cell culture and tissue engineering, for example, real-time detection of small molecules such as glucose, lactose, and H2O2 as well as serum proteins of large molecular size, such as albumin and alpha-fetoprotein, and inflammatory cytokines, such as IFN-g and TNF-α. In this review, we provide an overview of the recent advancements in biosensors for tissue engineering applications. PMID:25165697

  13. Advanced Developments in Cyclic Polymers: Synthesis, Applications, and Perspectives

    PubMed Central

    Zhu, Yinghuai; Hosmane, Narayan S

    2015-01-01

    Due to the topological effect, cyclic polymers demonstrate different and unique physical and biological properties in comparison with linear counterparts having the same molecular-weight range. With advanced synthetic and analytic technologies, cyclic polymers with different topologies, e.g. multicyclic polymers, have been reported and well characterized. For example, various cyclic DNA and related structures, such as cyclic duplexes, have been prepared conveniently by click chemistry. These types of DNA have increased resistance to enzymatic degradation and have high thermodynamic stability, and thus, have potential therapeutic applications. In addition, cyclic polymers have also been used to prepare organic–inorganic hybrids for applications in catalysis, e.g. catalyst supports. Due to developments in synthetic technology, highly pure cyclic polymers could now be produced in large scale. Therefore, we anticipate discovering more applications in the near future. Despite their promise, cyclic polymers are still less explored than linear polymers like polyolefins and polycarbonates, which are widely used in daily life. Some critical issues, including controlling the molecular weight and finding suitable applications, remain big challenges in the cyclic-polymer field. This review briefly summarizes the commonly used synthetic methodologies and focuses more on the attractive functional materials and their biological properties and potential applications. PMID:26478835

  14. Recent advances in application of biosensors in tissue engineering.

    PubMed

    Hasan, Anwarul; Nurunnabi, Md; Morshed, Mahboob; Paul, Arghya; Polini, Alessandro; Kuila, Tapas; Al Hariri, Moustafa; Lee, Yong-kyu; Jaffa, Ayad A

    2014-01-01

    Biosensors research is a fast growing field in which tens of thousands of papers have been published over the years, and the industry is now worth billions of dollars. The biosensor products have found their applications in numerous industries including food and beverages, agricultural, environmental, medical diagnostics, and pharmaceutical industries and many more. Even though numerous biosensors have been developed for detection of proteins, peptides, enzymes, and numerous other biomolecules for diverse applications, their applications in tissue engineering have remained limited. In recent years, there has been a growing interest in application of novel biosensors in cell culture and tissue engineering, for example, real-time detection of small molecules such as glucose, lactose, and H2O2 as well as serum proteins of large molecular size, such as albumin and alpha-fetoprotein, and inflammatory cytokines, such as IFN-g and TNF-α. In this review, we provide an overview of the recent advancements in biosensors for tissue engineering applications.

  15. Application of NASA's advanced life support technologies in polar regions

    NASA Astrophysics Data System (ADS)

    Bubenheim, D. L.; Lewis, C.

    1997-01-01

    NASA's advanced life support technologies are being combined with Arctic science and engineering knowledge in the Advanced Life Systems for Extreme Environments (ALSEE) project. This project addresses treatment and reduction of waste, purification and recycling of water, and production of food in remote communities of Alaska. The project focus is a major issue in the state of Alaska and other areas of the Circumpolar North; the health and welfare of people, their lives and the subsistence lifestyle in remote communities, care for the environment, and economic opportunity through technology transfer. The challenge is to implement the technologies in a manner compatible with the social and economic structures of native communities, the state, and the commercial sector. NASA goals are technology selection, system design and methods development of regenerative life support systems for planetary and Lunar bases and other space exploration missions. The ALSEE project will provide similar advanced technologies to address the multiple problems facing the remote communities of Alaska and provide an extreme environment testbed for future space applications. These technologies have never been assembled for this purpose. They offer an integrated approach to solving pressing problems in remote communities.

  16. Application of NASA's advanced life support technologies in polar regions.

    PubMed

    Bubenheim, D L; Lewis, C

    1997-01-01

    NASA's advanced life support technologies are being combined with Arctic science and engineering knowledge in the Advanced Life Systems for Extreme Environments (ALSEE) project. This project addresses treatment and reduction of waste, purification and recycling of water, and production of food in remote communities of Alaska. The project focus is a major issue in the state of Alaska and other areas of the Circumpolar North; the health and welfare of people, their lives and the subsistence lifestyle in remote communities, care for the environment, and economic opportunity through technology transfer. The challenge is to implement the technologies in a manner compatible with the social and economic structures of native communities, the state, and the commercial sector. NASA goals are technology selection, system design and methods development of regenerative life support systems for planetary and Lunar bases and other space exploration missions. The ALSEE project will provide similar advanced technologies to address the multiple problems facing the remote communities of Alaska and provide an extreme environment testbed for future space applications. These technologies have never been assembled for this purpose. They offer an integrated approach to solving pressing problems in remote communities.

  17. Advancing pig cloning technologies towards application in regenerative medicine.

    PubMed

    Nagashima, H; Matsunari, H; Nakano, K; Watanabe, M; Umeyama, K; Nagaya, M

    2012-08-01

    Regenerative medicine is expected to make a significant contribution by development of novel therapeutic treatments for intractable diseases and for improving the quality of life of patients. Many advances in regenerative medicine, including basic and translational research, have been developed and tested in experimental animals; pigs have played an important role in various aspects of this work. The value of pigs as a model species is being enhanced by the generation of specially designed animals through cloning and genetic modifications, enabling more sophisticated research to be performed and thus accelerating the clinical application of regenerative medicine. This article reviews the significant aspects of the creation and application of cloned and genetically modified pigs in regenerative medicine research and considers the possible future directions of the technology. We also discuss the importance of reproductive biology as an interface between basic science and clinical medicine.

  18. Advanced Electric Submersible Pump Design Tool for Geothermal Applications

    SciTech Connect

    Xuele Qi; Norman Turnquist; Farshad Ghasripoor

    2012-05-31

    Electrical Submersible Pumps (ESPs) present higher efficiency, larger production rate, and can be operated in deeper wells than the other geothermal artificial lifting systems. Enhanced Geothermal Systems (EGS) applications recommend lifting 300 C geothermal water at 80kg/s flow rate in a maximum 10-5/8-inch diameter wellbore to improve the cost-effectiveness. In this paper, an advanced ESP design tool comprising a 1D theoretical model and a 3D CFD analysis has been developed to design ESPs for geothermal applications. Design of Experiments was also performed to optimize the geometry and performance. The designed mixed-flow type centrifugal impeller and diffuser exhibit high efficiency and head rise under simulated EGS conditions. The design tool has been validated by comparing the prediction to experimental data of an existing ESP product.

  19. Modern transform design for advanced image/video coding applications

    NASA Astrophysics Data System (ADS)

    Tran, Trac D.; Topiwala, Pankaj N.

    2008-08-01

    This paper offers an overall review of recent advances in the design of modern transforms for image and video coding applications. Transforms have been an integral part of signal coding applications from the beginning, but emphasis had been on true floating-point transforms for most of that history. Recently, with the proliferation of low-power handheld multimedia devices, a new vision of integer-only transforms that provide high performance yet very low complexity has quickly gained ascendency. We explore two key design approaches to creating integer transforms, and focus on a systematic, universal method based on decomposition into lifting steps, and use of (dyadic) rational coefficients. This method provides a wealth of solutions, many of which are already in use in leading media codecs today, such as H.264, HD Photo/JPEG XR, and scalable audio. We give early indications in this paper, and more fully elsewhere.

  20. Recent advances in phosphate laser glasses for high power applications

    SciTech Connect

    Campbell, J.H.

    1996-05-14

    Recent advances in Nd-doped phosphate laser glasses for high-peak-power and high-average-power applications are reviewed. Compositional studies have progressed to the point that glasses can be tailored to have specific properties for specific applications. Non-radiative relaxation effects can be accurately modeled and empirical expressions have been developed to evaluate both intrinsic (structural) and extrinsic (contamination induced) relaxation effects. Losses due to surface scattering and bulk glass absorption have been carefully measured and can be accurately predicted. Improvements in processing have lead to high damage threshold (e.g. Pt inclusion free) and high thermal shock resistant glasses with improved edge claddings. High optical quality pieces up to 79 x 45 x 4cm{sup 3} have been made and methods for continuous melting laser glass are under development.

  1. Recent advances in the development and application of nanoelectrodes.

    PubMed

    Fan, Yunshan; Han, Chu; Zhang, Bo

    2016-10-01

    Nanoelectrodes have key advantages compared to electrodes of conventional size and are the tool of choice for numerous applications in both fundamental electrochemistry research and bioelectrochemical analysis. This Minireview summarizes recent advances in the development, characterization, and use of nanoelectrodes in nanoscale electroanalytical chemistry. Methods of nanoelectrode preparation include laser-pulled glass-sealed metal nanoelectrodes, mass-produced nanoelectrodes, carbon nanotube based and carbon-filled nanopipettes, and tunneling nanoelectrodes. Several new topics of their recent application are covered, which include the use of nanoelectrodes for electrochemical imaging at ultrahigh spatial resolution, imaging with nanoelectrodes and nanopipettes, electrochemical analysis of single cells, single enzymes, and single nanoparticles, and the use of nanoelectrodes to understand single nanobubbles. PMID:27510555

  2. Advanced Embedded Active Assemblies for Extreme Space Applications

    NASA Technical Reports Server (NTRS)

    DelCastillo, Linda; Moussessian, Alina; Mojarradi, Mohammad; Kolawa, Elizabeth

    2009-01-01

    This work describes the development and evaluation of advanced technologies for the integration of electronic die within membrane polymers. Specifically, investigators thinned silicon die, electrically connecting them with circuits on flexible liquid crystal polymer (LCP), using gold thermo-compression flip chip bonding, and embedding them within the material. Daisy chain LCP assemblies were thermal cycled from -135 to +85degC (Mars surface conditions for motor control electronics). The LCP assembly method was further utilized to embed an operational amplifier designed for operation within the Mars surface ambient. The embedded op-amp assembly was evaluated with respect to the influence of temperature on the operational characteristics of the device. Applications for this technology range from multifunctional, large area, flexible membrane structures to small-scale, flexible circuits that can be fit into tight spaces for flex to fit applications.

  3. Recent advances in industrial application of tannases: a review.

    PubMed

    Beniwal, Vikas; Kumar, Anil; Sharma, Jitender; Chhokar, Vinod

    2013-12-01

    Tannin acyl hydrolase (E.C. 3.1.1.20) commonly referred as tannase, is a hydrolytic enzyme that catalyses the hydrolysis of ester bonds present in gallotannins, ellagitannins, complex tannins and gallic acid esters. Tannases are the important group of botechnologically relevant enzymes distributed throughout the animal, plant and microbial kingdoms. However, microbial tannases are currently receiving a great deal of attention. Tannases are extensively used in food, feed, pharmaceutical, beverage, brewing and chemical industries. Owing to its diverse area of applications, a number of patents have been appeared in the recent past. The present review pretends to present the advances and perspectives in the industrial application of tannase with special emphasis on patents.

  4. Double exposure technology for KrF lithography

    NASA Astrophysics Data System (ADS)

    Geisler, S.; Bauer, J.; Haak, U.; Stolarek, D.; Schulz, K.; Wolf, H.; Meier, W.; Trojahn, M.; Matthus, E.; Beyer, H.; Old, G.; Marschmeyer, St.; Kuck, B.

    2008-04-01

    The application of Double Exposure Lithography (DEL) would enlarge the capability of 248 nm exposure technique to smaller pitch. We will use the DEL for the integration of critical layers for dedicated applications requiring resolution enhancement into 0.13 μm BiCMOS technology. In this paper we present the overlay precision and the focus difference of 1st and 2nd exposure as critical parameters of the DEL for k I <= 0.3 lithography (100 nm half pitch) with binary masks (BIM). The realization of excellent overlay (OVL) accuracy is a main key of double exposure and double patterning techniques. We show the DEL requires primarily a good mask registration, when the wafer stays in the scanner for both exposures without alignment between 1st and 2nd exposure. The exposure tool overlay error is more a practical limit for double patterning lithography (DPL). Hence we prefer the DEL for the resolution enhancement, especially if we use the KrF high NA lithography tool for 130 nm generation. Experimental and simulated results show that the critical dimension uniformity (CDU) depends strongly on the overlay precision. The DEL results show CDU is not only affected by the OVL but also by an optical proximity effect of 1st and 2nd exposure and the mask registration. The CD uniformity of DEL demands a low focus difference between 1st and 2nd exposure and therefore requires a good focus repeatability of the exposure tool. The Depth of Focus (DOF) of 490 nm at stable CD of lines was achieved for DEL. If we change the focus of one of the exposures the CD-focus performance of spaces was reduced with simultaneous line position changing. CDU vs. focus difference between 1st and 2nd exposure demands a focus repeatability <100 nm for the exposure tool. Summary, the results show DEL has the potential to be a practical lithography enhancement method for device fabrication using high NA KrF tool generation.

  5. Intelligent Facial Recognition Systems: Technology advancements for security applications

    SciTech Connect

    Beer, C.L.

    1993-07-01

    Insider problems such as theft and sabotage can occur within the security and surveillance realm of operations when unauthorized people obtain access to sensitive areas. A possible solution to these problems is a means to identify individuals (not just credentials or badges) in a given sensitive area and provide full time personnel accountability. One approach desirable at Department of Energy facilities for access control and/or personnel identification is an Intelligent Facial Recognition System (IFRS) that is non-invasive to personnel. Automatic facial recognition does not require the active participation of the enrolled subjects, unlike most other biological measurement (biometric) systems (e.g., fingerprint, hand geometry, or eye retinal scan systems). It is this feature that makes an IFRS attractive for applications other than access control such as emergency evacuation verification, screening, and personnel tracking. This paper discusses current technology that shows promising results for DOE and other security applications. A survey of research and development in facial recognition identified several companies and universities that were interested and/or involved in the area. A few advanced prototype systems were also identified. Sandia National Laboratories is currently evaluating facial recognition systems that are in the advanced prototype stage. The initial application for the evaluation is access control in a controlled environment with a constant background and with cooperative subjects. Further evaluations will be conducted in a less controlled environment, which may include a cluttered background and subjects that are not looking towards the camera. The outcome of the evaluations will help identify areas of facial recognition systems that need further development and will help to determine the effectiveness of the current systems for security applications.

  6. Prevention of optics and resist contamination in 300-mm lithography: improvements in chemical air filtration

    NASA Astrophysics Data System (ADS)

    Kinkead, Devon A.; Grayfer, Anatoly; Kishkovich, Oleg P.

    2001-08-01

    Atmospheric pressure deep UV lithography using fast chemically amplified photoresists will be the mainstay of semiconductor production into the foreseeable future. Airborne molecular contamination (AMC) in the form of bases and condensable organic and inorganic materials however, threaten both sensitive optics and modern resists thereby creating a host of yield limiting contamination issues. Past work by Kunz at MIT has described photo-induced organic contamination of lithographic optics as a significant concern in leading-edge lithography. Moreover, Kinkead and Ercken, and Kishkovich and Dean have published work on the impact of base contamination on CD uniformity in modern photoresists. Herein, the authors discuss solutions to control both optics and resist contamination in a single compact filter system for advanced lithography. The results of this work suggest that resist and optics contamination can be controlled as we enter the era of low K1 factor <150nm/300mm-device production.

  7. Nanoimprint lithography for green water-repellent film derived from biomass with high-light transparency

    NASA Astrophysics Data System (ADS)

    Takei, Satoshi; Hanabata, Makoto

    2015-03-01

    Newly eco-friendly high light transparency film with plant-based materials was investigated to future development of liquid crystal displays and optical devices with water repellency as a chemical design concept of nanoimprint lithography. This procedure is proven to be suitable for material design and the process conditions of ultraviolet curing nanoimprint lithography for green water-repellent film derived from biomass with high-light transparency. The developed formulation of advanced nanoimprinted materials design derived from lactulose and psicose, and the development of suitable UV nanoimprint conditions produced high resolutions of the conical shaped moth-eye regularly-nanostructure less than approximately 200 nm diameter, and acceptable patterning dimensional accuracy by the replication of 100 times of UV nanoimprint lithography cycles. The newly plant-based materials and the process conditions are expected as one of the defect less nanoimprint lithographic technologies in next generation electronic devices.

  8. Nanoparticle fabrication by geometrically confined nanosphere lithography

    NASA Astrophysics Data System (ADS)

    Denomme, Ryan C.; Iyer, Krishna; Kreder, Michael; Smith, Brendan; Nieva, Patricia M.

    2013-07-01

    Arrays of metal nanoparticles, typically gold or silver, exhibit localized surface plasmon resonance, a phenomenon that has many applications, such as chemical and biological sensing. However, fabrication of metal nanoparticle arrays with high uniformity and repeatability, at a reasonable cost, is difficult. Nanosphere lithography (NSL) has been used before to produce inexpensive nanoparticle arrays through the use of monolayers of self-assembled microspheres as a deposition mask. However, control over the size and location of the arrays, as well as uniformity over large areas is poor, thus limiting its use to research purposes. In this paper, a new NSL method, called here geometrically confined NSL (GCNSL), is presented. In GCNSL, microsphere assembly is confined to geometric patterns defined in photoresist, allowing high-precision and large-scale nanoparticle patterning while still remaining low cost. Using this new method, it is demonstrated that 400 nm polystyrene microspheres can be assembled inside of large arrays of photoresist patterns. Results show that optimal microsphere assembly is achieved with long and narrow rectangular photoresist patterns. The combination of microsphere monolayers and photoresist patterns is then used as a deposition mask to produce silver nanoparticles at precise locations on the substrate with high uniformity, repeatability, and quality.

  9. Resist profile simulation with fast lithography model

    NASA Astrophysics Data System (ADS)

    He, Yan-Ying; Chou, Chih-Shiang; Tang, Yu-Po; Huang, Wen-Chun; Liu, Ru-Gun; Gau, Tsai-Sheng

    2014-03-01

    A traditional approach to construct a fast lithographic model is to match wafer top-down SEM images, contours and/or gauge CDs with a TCC model plus some simple resist representation. This modeling method has been proven and is extensively used for OPC modeling. As the technology moves forward, this traditional approach has become insufficient in regard to lithography weak point detection, etching bias prediction, etc. The drawback of this approach is from metrology and simulation. First, top-down SEM is only good for acquiring planar CD information. Some 3D metrology such as cross-section SEM or AFM is necessary to obtain the true resist profile. Second, the TCC modeling approach is only suitable for planar image simulation. In order to model the resist profile, full 3D image simulation is needed. Even though there are many rigorous simulators capable of catching the resist profile very well, none of them is feasible for full-chip application due to the tremendous consumption of computational resource. The authors have proposed a quasi-3D image simulation method in the previous study [1], which is suitable for full-chip simulation with the consideration of sidewall angles, to improve the model accuracy of planar models. In this paper, the quasi-3D image simulation is extended to directly model the resist profile with AFM and/or cross-section SEM data. Resist weak points detected by the model generated with this 3D approach are verified on the wafer.

  10. A Low-Cost Hands-On Laboratory to Introduce Lithography Concepts

    ERIC Educational Resources Information Center

    Jalali, M.; Marti, J. J.; Kirchhoff, A. L.; Lawrenz, F.; Campbell, S. A.

    2012-01-01

    A lithography lab course has been developed that is applicable to students from the middle-school level up to college students. It can also be inserted into electronics technology or similar courses in two- and four-year colleges, or used to demonstrate applications of polymers in chemistry classes. Some of these techniques would enable research…

  11. Advanced Ceramic Matrix Composites (CMCs) for High Temperature Applications

    NASA Technical Reports Server (NTRS)

    Singh, M.

    2005-01-01

    Advanced ceramic matrix composites (CMCs) are enabling materials for a number of demanding applications in aerospace, energy, and nuclear industries. In the aerospace systems, these materials are being considered for applications in hot sections of jet engines such as the combustor liner, vanes, nozzle components, nose cones, leading edges of reentry vehicles, and space propulsion components. Applications in the energy and environmental industries include radiant heater tubes, heat exchangers, heat recuperators, gas and diesel particulate filters, and components for land based turbines for power generation. These materials are also being considered for use in the first wall and blanket components of fusion reactors. In the last few years, a number of CMC components have been developed and successfully tested for various aerospace and ground based applications. However, a number of challenges still remain slowing the wide scale implementation of these materials. They include robust fabrication and manufacturing, assembly and integration, coatings, property modeling and life prediction, design codes and databases, repair and refurbishment, and cost. Fabrication of net and complex shape components with high density and tailorable matrix properties is quite expensive, and even then various desirable properties are not achievable. In this presentation, a number of examples of successful CMC component development and testing will be provided. In addition, critical need for robust manufacturing, joining and assembly technologies in successful implementation of these systems will be discussed.

  12. Extreme-UV lithography condenser

    DOEpatents

    Sweatt, William C.; Sweeney, Donald W.; Shafer, David; McGuire, James

    2001-01-01

    Condenser system for use with a ringfield camera in projection lithography where the condenser includes a series of segments of a parent aspheric mirror having one foci at a quasi-point source of radiation and the other foci at the radius of a ringfield have all but one or all of their beams translated and rotated by sets of mirrors such that all of the beams pass through the real entrance pupil of a ringfield camera about one of the beams and fall onto the ringfield radius as a coincident image as an arc of the ringfield. The condenser has a set of correcting mirrors with one of the correcting mirrors of each set, or a mirror that is common to said sets of mirrors, from which the radiation emanates, is a concave mirror that is positioned to shape a beam segment having a chord angle of about 25 to 85 degrees into a second beam segment having a chord angle of about 0 to 60 degrees.

  13. Masks for extreme ultraviolet lithography

    SciTech Connect

    Cardinale, G; Goldsmith, J; Kearney, P A; Larson, C; Moore, C E; Prisbrey, S; Tong, W; Vernon, S P; Weber, F; Yan, P-Y

    1998-09-01

    In extreme ultraviolet lithography (EUVL), the technology specific requirements on the mask are a direct consequence of the utilization of radiation in the spectral region between 10 and 15 nm. At these wavelengths, all condensed materials are highly absorbing and efficient radiation transport mandates the use of all-reflective optical systems. Reflectivity is achieved with resonant, wavelength-matched multilayer (ML) coatings on all of the optical surfaces - including the mask. The EUV mask has a unique architecture - it consists of a substrate with a highly reflective ML coating (the mask blank) that is subsequently over-coated with a patterned absorber layer (the mask). Particulate contamination on the EUVL mask surface, errors in absorber definition and defects in the ML coating all have the potential to print in the lithographic process. While highly developed technologies exist for repair of the absorber layer, no viable strategy for the repair of ML coating defects has been identified. In this paper the state-of-the-art in ML deposition technology, optical inspection of EUVL mask blank defects and candidate absorber patterning approaches are reviewed.

  14. Semiconductor foundry, lithography, and partners

    NASA Astrophysics Data System (ADS)

    Lin, Burn J.

    2002-07-01

    The semiconductor foundry took off in 1990 with an annual capacity of less than 0.1M 8-inch-equivalent wafers at the 2-mm node. In 2000, the annual capacity rose to more than 10M. Initially, the technology practiced at foundries was 1 to 2 generations behind that at integrated device manufacturers (IDMs). Presently, the progress in 0.13-mm manufacturing goes hand-in-hand with any of the IDMs. There is a two-order of magnitude rise in output and the progress of technology development outpaces IDMs. What are the reasons of the success? Is it possible to sustain the pace? This paper shows the quick rise of foundries in capacity, sales, and market share. It discusses the their uniqueness which gives rise to advantages in conjunction with challenges. It also shows the role foundries take with their customer partners and supplier partners, their mutual dependencies, as well as expectations. What role then does lithography play in the foundries? What are the lithographic challenges to sustain the pace of technology? The experience of technology development and transfer, at one of the major foundries, is used to illustrate the difficulties and progresses made. Looking into the future, as semiconductor manufacturing will become even more expensive and capital investment more prohibitive, we will make an attempt to suggest possible solutions.

  15. Multi-focal multiphoton lithography.

    PubMed

    Ritschdorff, Eric T; Nielson, Rex; Shear, Jason B

    2012-03-01

    Multiphoton lithography (MPL) provides unparalleled capabilities for creating high-resolution, three-dimensional (3D) materials from a broad spectrum of building blocks and with few limitations on geometry, qualities that have been key to the design of chemically, mechanically, and biologically functional microforms. Unfortunately, the reliance of MPL on laser scanning limits the speed at which fabrication can be performed, making it impractical in many instances to produce large-scale, high-resolution objects such as complex micromachines, 3D microfluidics, etc. Previously, others have demonstrated the possibility of using multiple laser foci to simultaneously perform MPL at numerous sites in parallel, but use of a stage-scanning system to specify fabrication coordinates resulted in the production of identical features at each focal position. As a more general solution to the bottleneck problem, we demonstrate here the feasibility for performing multi-focal MPL using a dynamic mask to differentially modulate foci, an approach that enables each fabrication site to create independent (uncorrelated) features within a larger, integrated microform. In this proof-of-concept study, two simultaneously scanned foci produced the expected two-fold decrease in fabrication time, and this approach could be readily extended to many scanning foci by using a more powerful laser. Finally, we show that use of multiple foci in MPL can be exploited to assign heterogeneous properties (such as differential swelling) to micromaterials at distinct positions within a fabrication zone.

  16. Multi-focal multiphoton lithography.

    PubMed

    Ritschdorff, Eric T; Nielson, Rex; Shear, Jason B

    2012-03-01

    Multiphoton lithography (MPL) provides unparalleled capabilities for creating high-resolution, three-dimensional (3D) materials from a broad spectrum of building blocks and with few limitations on geometry, qualities that have been key to the design of chemically, mechanically, and biologically functional microforms. Unfortunately, the reliance of MPL on laser scanning limits the speed at which fabrication can be performed, making it impractical in many instances to produce large-scale, high-resolution objects such as complex micromachines, 3D microfluidics, etc. Previously, others have demonstrated the possibility of using multiple laser foci to simultaneously perform MPL at numerous sites in parallel, but use of a stage-scanning system to specify fabrication coordinates resulted in the production of identical features at each focal position. As a more general solution to the bottleneck problem, we demonstrate here the feasibility for performing multi-focal MPL using a dynamic mask to differentially modulate foci, an approach that enables each fabrication site to create independent (uncorrelated) features within a larger, integrated microform. In this proof-of-concept study, two simultaneously scanned foci produced the expected two-fold decrease in fabrication time, and this approach could be readily extended to many scanning foci by using a more powerful laser. Finally, we show that use of multiple foci in MPL can be exploited to assign heterogeneous properties (such as differential swelling) to micromaterials at distinct positions within a fabrication zone. PMID:22282105

  17. Secondary Electrons in EUV Lithography

    SciTech Connect

    Torok, Justin; Re, Ryan Del; Herbol, Henry; Das, Sanjana; Bocharova, Irina; Paolucci, Angela; Ocola, Leonidas E.; Ventrice Jr., Carl; Lifshin, Eric; Denbeaux, Greg; Brainard, Robert L.

    2013-01-01

    Secondary electrons play critical roles in several imaging technologies, including extreme ultraviolet (EUV) lithography. At longer wavelengths of light (e.g. 193 and 248 nm), the photons are directly involved in the photochemistry occurring during photolysis. EUV light (13.5 nm, 92 eV), however, first creates a photoelectron, and this electron, or its subsequent daughter electrons create most of the chemical changes that occur during exposure. Despite the importance of these electrons, the details surrounding the chemical events leading to acid production remain poorly understood. Previously reported experimental results using high PAG-loaded resists have demonstrated that up to five or six photoacids can be generated per incident photon. Until recently, only electron recombination events were thought to play a role in acid generation, requiring that at least as many secondary electrons are produced to yield a given number of acid molecules. However, the initial results we have obtained using a Monte Carlo-based modeling program, LESiS, demonstrate that only two to three secondary electrons are made per absorbed EUV photon. A more comprehensive understanding of EUV-induced acid generation is therefore needed for the development of higher performance resists

  18. Vacuum-free self-powered parallel electron lithography with sub-35-nm resolution.

    PubMed

    Lu, Yuerui; Lal, Amit

    2010-06-01

    The critical dimension, throughput, and cost of nanolithography are central to developing commercially viable high-performance nanodevices. Available top-down lithography approaches to fabricate large-area nanostructures at low cost, such as controllable nanowire (NW) array fabrication for solar cells applications, are challenging due to the requirement of both high lithography resolution and high throughput. Here, a minimum 35 nm resolution is experimentally demonstrated by using a new mask fabrication technique in our demonstrated vacuum-free high-throughput self-powered parallel electron lithography (SPEL) system, which uses large-area planar radioactive beta-electron thin film emitters to parallel expose e-beam resist through a stencil mask. SPEL is the first-time demonstrated vacuum-free electron lithography, which overcomes the membrane mask distortion challenge that was shown to be the Achilles heel of previous attempts at electron projection lithography in vacuum. Monte Carlo simulations show that by using beryllium tritide thin film source in SPEL system, the exposure time can be reduced down to 2 min for each large-area (10000 cm(2) or more) parallel exposure, with resolution not larger than 20 nm. Moreover, experimental demonstration of large-area diameter-and-density controllable vertical NW arrays fabricated by SPEL shows its promising utility for an application requiring large-area nanostructure definition. PMID:20481509

  19. Advanced carbon manufacturing for energy and biological applications

    NASA Astrophysics Data System (ADS)

    Turon Teixidor, Genis

    The science of miniaturization has experienced revolutionary advances during the last decades, witnessing the development of the Integrated Circuit and the emergence of MEMS and Nanotechnology. Particularly, MEMS technology has pioneered the use of non-traditional materials in microfabrication by including polymers, ceramics and composites to the well known list of metals and semiconductors. One of the latest additions to this set of materials is carbon, which represents a very important inclusion given its significance in electrochemical energy conversion systems and in applications where it is used as sensor probe material. For these applications, carbon is optimal in several counts: It has a wide electrochemical stability window, good electrical and thermal conductivity, high corrosion resistance and mechanical stability, and is available in high purity at a low cost. Furthermore carbon is biocompatible. This thesis presents several microfabricated devices that take advantage of these properties. The thesis has two clearly differentiated parts. In the first one, applications of micromachined carbon in the field of energy conversion and energy storage are presented. These applications include lithium ion micro batteries and the development of new carbon electrodes with fractal geometries. In the second part, the focus shifts to biological applications. First, the study of the interaction of living cells with micromachined carbon is presented, followed by the description of a sensor based on interdigitated nano-electrode arrays, and finally the development of the new instrumentation needed to address arrays of carbon electrodes, a multiplexed potentiostat. The underlying theme that connects all these seemingly different topics is the use of carbon microfabrication techniques in electrochemical systems.

  20. The use of advanced materials in space structure applications

    NASA Astrophysics Data System (ADS)

    Eaton, D. C. G.; Slachmuylders, E. J.

    The last decade has seen the Space applications of composite materials become almost commonplace in the construction of configurations requiring high stiffness and/or dimensional stability, particularly in the field of antennas. As experience has been accumulated, applications for load carrying structures utilizing the inherent high specific strength/stiffness of carbon fibres have become more frequent. Some typical examples of these and their design development criteria are reviewed. As these structures and the use of new plastic matrices emerge, considerable attention has to be given to establishing essential integrity control requirements from both safety and cost aspects. The advent of manned European space flight places greater emphasis on such requirements. Attention is given to developments in the fields of metallic structures with discussion of the advantages and disadvantages of their application. The design and development of hot structures, thermal protection systems and air-breathing engines for future launch vehicles necessitates the use of the emerging metal/matrix and other advanced materials. Some of their important features are outlined. Means of achieving such objectives by greater harmonization within Europe are emphasized. Typical examples of on-going activities to promote such collaboration are described.

  1. Cost-effective x-ray lithography

    NASA Astrophysics Data System (ADS)

    Roltsch, Tom J.

    1991-08-01

    The push towards faster, denser VLSI device structures and eventually to ULSI devices means ever-decreasing design rules for IC manufacturers. In order to define patterns on silicon and gallium arsenide substrates with feature sizes of 0.25 microns, lithography, metallization, and electronic materials processing techniques will be pushed beyond current limitations. Of these technologies, lithography in the sub-0.5 micron region appears to be the main obstacle yet to be overcome. As deep-UV optical systems become more expensive and the useful field sized decrease in the attempt to achieve finer resolutions, the question of whether to switch to an alternate lithographic method becomes imminent. X-ray lithography is the leading candidate. In this paper, the question of whether x-ray lithography is economically superior to optical lithography and the cost-effectiveness of x-ray lithography are addressed. Also, the question of how x-ray lithography can be performed in a production environment is considered. First shown is that more elaborate optical systems are simply not going to match x-ray proximity system in terms of resolution because of the need to use exotic lens materials or complicated and ever finer reflection systems, none of which can correct for diffraction effects, yet must be corrected for every other aberration. The economic superiority of a synchrotron-based x- ray lithography beamline is demonstrated in a production facility using a processing-cost model based on Shinji Okazaki's cost-per-bit model. Considered, as well, is the strong possibility that exists for the use of an optically based production line which would use an anode or plasma x-ray stepper to define only the smallest geometries, such as the gate level on a DRAM chip. It is shown that it is unlikely, even pushing the limits of materials and optics, that deep-UV systems will be able to define patterns below 0.35 microns in a production environment. X-ray lithography systems could define 0

  2. Applications for thermal NDT on advanced composites in aerospace structures

    NASA Astrophysics Data System (ADS)

    Baughman, Steve R.

    1998-03-01

    Following several years of investigating active thermal imaging techniques, Lockheed Martin Aeronautical Systems Company (LMASC) has introduced a portable, time-dependent thermography (TDT) system into the production inspection environment. Originally pursued as a rapid, non-contacting, nondestructive evaluation (NDE) tool for inspecting large surface areas, the TDT system has proven most useful as a rapid verification tool on advanced composite assemblies. TDT is a relatively new NDE methodology as compared to conventional ultrasonic and radiography testing. SEveral technical issues are being addressed as confidence in the system's capabilities increase. These include inspector training and certification, system sensitivity assessments, and test results interpretation. Starting in 1991, LMASC began a beta-site evaluation of a prototype TDT system developed by the Institute of Manufacturing Research at Wayne State University. This prototype was the forerunner of the current production system, which is offered commercially as a fully integrated thermal NDE system. Applications investigated to data include quality assurance of advanced aerospace composite structures/assemblies for disbonds/voids between skin and core. TDT has a number of advantages over traditional NDT methods. The process of acquiring thermal images is fast, and can decrease inspection time required to locate suspect areas. The system also holds promise for depot level inspections due to its portability. This paper describes a systematic approach to implementing TDT into the production inspection arena.

  3. Recent advances in bioprocessing application of membrane chromatography.

    PubMed

    Orr, Valerie; Zhong, Luyang; Moo-Young, Murray; Chou, C Perry

    2013-01-01

    Compared to traditional chromatography using resins in packed-bed columns, membrane chromatography is a relatively new and immature bioseparation technology based on the integration of membrane filtration and liquid chromatography into a single-stage operation. Over the past decades, advances in membrane chemistry have yielded novel membrane devices with high binding capacities and improved mass transfer properties, significantly increasing the bioprocessing efficiency for purification of biomolecules. Due to the disposable nature, low buffer consumption, and reduced equipment costs, membrane chromatography can significantly reduce downstream bioprocessing costs. In this review, we discuss technological merits and disadvantages associated with membrane chromatography as well as recent bioseparation applications with a particular attention on purification of large biomolecules.

  4. Recent advances of HTS power application research at IEE

    NASA Astrophysics Data System (ADS)

    Ma, Yanwei; Lin, Liangzhen; Xiao, Liye

    2006-06-01

    Recent advances of high temperature superconductors (HTS) for power applications in the Institute of Electrical Engineering (IEE), Chinese academy of Sciences are presented. A 75 meter, 10.5 kV/1.5 kA three phase HTS transmission cable has been successfully demonstrated in a live distribution grid in northwest China. A 10.5 kV/200A bridge-type fault current limiter (FCL) prototype based on Bi-2223 tapes is being tested in a Hunan power plant since August 2005. A 400V/16V/26 kVA three phase HTS transformer was designed, built and tested, and the on site system installation of a 10.5 kV/400V/630 kVA HTS transformer will be finished at Tebian Electric Ltd. soon. In addition, the progress of design and test of SMES is also given.

  5. SciDAC Advances and Applications in Computational Beam Dynamics

    SciTech Connect

    Ryne, R.; Abell, D.; Adelmann, A.; Amundson, J.; Bohn, C.; Cary, J.; Colella, P.; Dechow, D.; Decyk, V.; Dragt, A.; Gerber, R.; Habib, S.; Higdon, D.; Katsouleas, T.; Ma, K.-L.; McCorquodale, P.; Mihalcea, D.; Mitchell, C.; Mori, W.; Mottershead, C.T.; Neri, F.; Pogorelov, I.; Qiang, J.; Samulyak, R.; Serafini, D.; Shalf, J.; Siegerist, C.; Spentzouris, P.; Stoltz, P.; Terzic, B.; Venturini, M.; Walstrom, P.

    2005-06-26

    SciDAC has had a major impact on computational beam dynamics and the design of particle accelerators. Particle accelerators--which account for half of the facilities in the DOE Office of Science Facilities for the Future of Science 20 Year Outlook--are crucial for US scientific, industrial, and economic competitiveness. Thanks to SciDAC, accelerator design calculations that were once thought impossible are now carried routinely, and new challenging and important calculations are within reach. SciDAC accelerator modeling codes are being used to get the most science out of existing facilities, to produce optimal designs for future facilities, and to explore advanced accelerator concepts that may hold the key to qualitatively new ways of accelerating charged particle beams. In this poster we present highlights from the SciDAC Accelerator Science and Technology (AST) project Beam Dynamics focus area in regard to algorithm development, software development, and applications.

  6. Marine biotechnology advances towards applications in new functional foods.

    PubMed

    Freitas, Ana C; Rodrigues, Dina; Rocha-Santos, Teresa A P; Gomes, Ana M P; Duarte, Armando C

    2012-01-01

    The marine ecosystem is still an untapped reservoir of biologically active compounds, which have considerable potential to supply food ingredients towards development of new functional foods. With the goal of increasing the availability and chemical diversity of functional marine ingredients, much research has been developed using biotechnological tools to discover and produce new compounds. This review summarizes the advances in biotechnological tools for production of functional ingredients, including enzymes, for the food industry. Tools involving biotechnological processes (bioreactors, fermentations, bioprocessing) and those involving genetic research designated as molecular biotechnology are discussed highlighting how they can be used in the controlled manipulation and utilization of marine organisms as sources of food ingredients, as well as discussing the most relevant shortcomings towards applications in new functional foods. PMID:22484300

  7. Evaluation of undeveloped rocket engine cycle applications to advanced transportation

    NASA Technical Reports Server (NTRS)

    1990-01-01

    Undeveloped pump-fed, liquid propellant rocket engine cycles were assessed and evaluated for application to Next Manned Transportation System (NMTS) vehicles, which would include the evolving Space Transportation System (STS Evolution), the Personnel Launch System (PLS), and the Advanced Manned Launch System (AMLS). Undeveloped engine cycles selected for further analysis had potential for increased reliability, more maintainability, reduced cost, and improved (or possibly level) performance when compared to the existing SSME and proposed STME engines. The split expander (SX) cycle, the full flow staged combustion (FFSC) cycle, and a hybrid version of the FFSC, which has a LOX expander drive for the LOX pump, were selected for definition and analysis. Technology requirements and issues were identified and analyses of vehicle systems weight deltas using the SX and FFSC cycles in AMLS vehicles were performed. A strawman schedule and cost estimate for FFSC subsystem technology developments and integrated engine system demonstration was also provided.

  8. Applications of Isotopes in Advancing Structural & Functional Heparanomics

    PubMed Central

    Tran, Vy M.; Nu Nguyen, Thao Kim; Raman, Karthik; Kuberan, Balagurunathan

    2011-01-01

    Heparanomics is the study of all the biologically active oligosaccharide domain structures in the entire heparanome and the nature of interactions among these domains and their protein ligands. Structural elucidation of heparan sulfate and heparin oligosaccharides is a major obstacle in advancing structure-function relationships and the study of heparanomics. There are several factors that exacerbate challenges involved in the structural elucidation of heparin and heparan sulfate. Therefore, there is a great interest in developing novel strategies and analytical tools to overcome the barriers in decoding the enigmatic heparanome. This review article focuses on the applications of isotopes, both radioisotopes and stable isotopes, in the structural elucidation of the complex heparanome at the disaccharide or oligosaccharide level using liquid chromatography, nuclear magnetic resonance spectroscopy and mass spectrometry. This review article also outlines the utility of isotopes in determining the substrate specificity of biosynthetic enzymes that eventually dictate the emergence of biologically active oligosaccharides. PMID:20838780

  9. Applications of isotopes in advancing structural and functional heparanomics.

    PubMed

    Tran, Vy M; Nguyen, Thao K N; Raman, Karthik; Kuberan, Balagurunathan

    2011-01-01

    Heparanomics is the study of all the biologically active oligosaccharide domain structures in the entire heparanome and the nature of the interactions among these domains and their protein ligands. Structural elucidation of heparan sulfate and heparin oligosaccharides is a major obstacle in advancing structure-function relationships and heparanomics. There are several factors that exacerbate the challenges involved in the structural elucidation of heparin and heparan sulfate; therefore, there is great interest in developing novel strategies and analytical tools to overcome the barriers in decoding the enigmatic heparanome. This review focuses on the applications of isotopes, both radioisotopes and stable isotopes, in the structural elucidation of the complex heparanome at the disaccharide or oligosaccharide level using liquid chromatography, nuclear magnetic resonance spectroscopy, and mass spectrometry. This review also outlines the utility of isotopes in determining the substrate specificity of biosynthetic enzymes that eventually dictate the emergence of biologically active oligosaccharides.

  10. Experiments applications guide: Advanced Communications Technology Satellite (ACTS)

    NASA Technical Reports Server (NTRS)

    1988-01-01

    This applications guide first surveys the capabilities of the Advanced Communication Technology Satellite (ACTS) system (both the flight and ground segments). This overview is followed by a description of the baseband processor (BBP) and microwave switch matrix (MSM) operating modes. Terminals operating with the baseband processor are referred to as low burst rate (LBR); and those operating with the microwave switch matrix, as high burst rate (HBR). Three very small-aperture terminals (VSATs), LBR-1, LBR-2, and HBR, are described for various ACTS operating modes. Also described is the NASA Lewis link evaluation terminal. A section on ACTS experiment opportunities introduces a wide spectrum of network control, telecommunications, system, and scientific experiments. The performance of the VSATs is discussed in detail. This guide is intended as a catalyst to encourage participation by the telecommunications, business, and science communities in a broad spectrum of experiments.

  11. 3D-QSAR - Applications, Recent Advances, and Limitations

    NASA Astrophysics Data System (ADS)

    Sippl, Wolfgang

    Three-dimensional quantitative structure-activity relationship (3D-QSAR) techniques are the most prominent computational means to support chemistry within drug design projects where no three-dimensional structure of the macromolecular target is available. The primary aim of these techniques is to establish a correlation of biological activities of a series of structurally and biologically characterized compounds with the spatial fingerprints of numerous field properties of each molecule, such as steric demand, lipophilicity, and electrostatic interactions. The number of 3D-QSAR studies has exponentially increased over the last decade, since a variety of methods are commercially available in user-friendly, graphically guided software. In this chapter, we will review recent advances, known limitations, and the application of receptor-based 3D-QSAR

  12. Joining SI3N4 for Advanced Turbomachinery Applications

    SciTech Connect

    GLASS, S. JILL; LOEHMAN, RONALD E.; HOSKING, F. MICHAEL; STEPHENS JR., JOHN J.; VIANCO, PAUL T.; NEILSEN, MICHAEL K.; WALKER, CHARLES A.; POLLINGER, J.P.; MAHONEY, F.M.; QUILLEN, B.G.

    2000-07-01

    The main objective of this project was to develop reliable, low-cost techniques for joining silicon nitride (Si{sub 3}N{sub 4}) to itself and to metals. For Si{sub 3}N{sub 4} to be widely used in advanced turbomachinery applications, joining techniques must be developed that are reliable, cost-effective, and manufacturable. This project addressed those needs by developing and testing two Si{sub 3}N{sub 4} joining systems; oxynitride glass joining materials and high temperature braze alloys. Extensive measurements were also made of the mechanical properties and oxidation resistance of the braze materials. Finite element models were used to predict the magnitudes and positions of the stresses in the ceramic regions of ceramic-to-metal joints sleeve and butt joints, similar to the geometries used for stator assemblies.

  13. Advanced Power Batteries for Renewable Energy Applications 3.09

    SciTech Connect

    Shane, Rodney

    2011-12-01

    This report describes the research that was completed under project title Advanced Power Batteries for Renewable Energy Applications 3.09, Award Number DE-EE0001112. The report details all tasks described in the Statement of Project Objectives (SOPO). The SOPO includes purchasing of test equipment, designing tooling, building cells and batteries, testing all variables and final evaluation of results. The SOPO is included. There were various types of tests performed during the project, such as; gas collection, float current monitoring, initial capacity, high rate partial state of charge (HRPSoC), hybrid pulse power characterization (HPPC), high rate capacity, corrosion, software modeling and solar life cycle tests. The grant covered a period of two years starting October 1, 2009 and ending September 30, 2011.

  14. Cardiovascular genetics: technological advancements and applicability for dilated cardiomyopathy.

    PubMed

    Kummeling, G J M; Baas, A F; Harakalova, M; van der Smagt, J J; Asselbergs, F W

    2015-07-01

    Genetics plays an important role in the pathophysiology of cardiovascular diseases, and is increasingly being integrated into clinical practice. Since 2008, both capacity and cost-efficiency of mutation screening of DNA have been increased magnificently due to the technological advancement obtained by next-generation sequencing. Hence, the discovery rate of genetic defects in cardiovascular genetics has grown rapidly and the financial threshold for gene diagnostics has been lowered, making large-scale DNA sequencing broadly accessible. In this review, the genetic variants, mutations and inheritance models are briefly introduced, after which an overview is provided of current clinical and technological applications in gene diagnostics and research for cardiovascular disease and in particular, dilated cardiomyopathy. Finally, a reflection on the future perspectives in cardiogenetics is given.

  15. Recent advances in bioprinting techniques: approaches, applications and future prospects.

    PubMed

    Li, Jipeng; Chen, Mingjiao; Fan, Xianqun; Zhou, Huifang

    2016-01-01

    Bioprinting technology shows potential in tissue engineering for the fabrication of scaffolds, cells, tissues and organs reproducibly and with high accuracy. Bioprinting technologies are mainly divided into three categories, inkjet-based bioprinting, pressure-assisted bioprinting and laser-assisted bioprinting, based on their underlying printing principles. These various printing technologies have their advantages and limitations. Bioprinting utilizes biomaterials, cells or cell factors as a "bioink" to fabricate prospective tissue structures. Biomaterial parameters such as biocompatibility, cell viability and the cellular microenvironment strongly influence the printed product. Various printing technologies have been investigated, and great progress has been made in printing various types of tissue, including vasculature, heart, bone, cartilage, skin and liver. This review introduces basic principles and key aspects of some frequently used printing technologies. We focus on recent advances in three-dimensional printing applications, current challenges and future directions. PMID:27645770

  16. Development of Advanced Robotic Hand System for space application

    NASA Technical Reports Server (NTRS)

    Machida, Kazuo; Akita, Kenzo; Mikami, Tatsuo; Komada, Satoru

    1994-01-01

    The Advanced Robotic Hand System (ARH) is a precise telerobotics system with a semi dexterous hand for future space application. The ARH will be tested in space as one of the missions of the Engineering Tests Satellite 7 (ETS-7) which will be launched in 1997. The objectives of the ARH development are to evaluate the capability of a possible robot hand for precise and delicate tasks and to validate the related technologies implemented in the system. The ARH is designed to be controlled both from ground as a teleoperation and by locally autonomous control. This paper presents the overall system design and the functional capabilities of the ARH as well as its mission outline as the preliminary design has been completed.

  17. High-n immersion lithography

    NASA Astrophysics Data System (ADS)

    Sewell, Harry; Mulkens, Jan; Graeupner, Paul; McCafferty, Diane; Markoya, Louis; Donders, Sjoerd; Cortie, Rogier; Meijers, Ralph; Evangelista, Fabrizio; Samarakone, Nandarisi

    2008-03-01

    A two-year study on the feasibility of High-n Immersion Lithography shows very promising results. This paper reports the findings of the study. The evaluation shows the tremendous progress made in the development of second-generation immersion fluid technology. Candidate fluids from several suppliers have been evaluated. All the commercial fluids evaluated are viable, so there are a number of options. Life tests have been conducted on bench top fluid-handling systems and the results referenced to full-scale systems. Parameters such as Dose per Laser Pulse, Pulse Rate, Fluid Flow Rate, and Fluid Absorbency at 193nm, and Oxygen/Air Contamination Levels were explored. A detailed evaluation of phenomena such as Last Lens Element (LLE) contamination has been conducted. Lens cleaning has been evaluated. A comparison of High-n fluid-based technology and water-based immersion technology shows interesting advantages of High-n fluid in the areas of Defect and Resist Interaction. Droplet Drying tests, Resist Staining evaluations, and Resist Contrast impact studies have all been run. Defect-generating mechanisms have been identified and are being eliminated. The lower evaporation rate of the High-n fluids compared with water shows the advantages of High-n Immersion. The core issue for the technology, the availability of High-n optical material for use as the final lens element, is updated. Samples of LuAG material have been received from development partners and have been evaluated. The latest status of optical materials and the technology timelines are reported. The potential impact of the availability of the technology is discussed. Synergy with technologies such as Double Patterning is discussed. The prospects for <22nm (hp) are evaluated.

  18. Fabrication and application of advanced functional materials from lignincellulosic biomass

    NASA Astrophysics Data System (ADS)

    Hu, Sixiao

    This dissertation explored the conversion of lignocellulosic biomass into advanced functional materials and their potential applications. Lignocellulosic biomass represents an as-of-yet underutilized renewable source for not only biofuel production but also functional materials fabrication. This renewable source is a great alternative for fossil fuel based chemicals, which could be one of the solutions to energy crisis. In this work, it was demonstrated a variety of advanced materials including functional carbons, metal and silica nanoparticles could be derived from lignocellulosic biomass. Chapter 1 provided overall reviewed of the lignin structures, productions and its utilizations as plastics, absorbents and carbons, as well as the preparation of nano-structured silver, silica and silicon carbide/nitride from biomass. Chapter 2, 3 and 4 discussed the fabrication of highly porous carbons from isolated lignin, and their applications as electric supercapacitors for energy storage. In chapter 2, ultrafine porous carbon fibers were prepared via electrospinning followed by simultaneous carbonization and activation. Chapter 3 covered the fabrication of supercapacitor based on the porous carbon fibers and the investigation of their electrochemical performances. In chapter 4, porous carbon particulates with layered carbon nano plates structures were produced by simple oven-drying followed by simultaneous carbonization and activation. The effects of heat processing parameters on the resulting carbon structures and their electrochemical properties were discussed in details. Chapter 5 and 6 addressed the preparation of silver nanoparticles using lignin. Chapter 5 reported the synthesis, underlying kinetics and mechanism of monodispersed silver nanospheres with diameter less than 25 nm in aqueous solutions using lignin as dual reducing and capping agents. Chapter 6 covered the preparation of silver nanoparticles on electrospun celluloses ultrafine fibers using lignin as both

  19. Self-cleaning optic for extreme ultraviolet lithography

    DOEpatents

    Klebanoff, Leonard E.; Stulen, Richard H.

    2003-12-16

    A multilayer reflective optic or mirror for lithographic applications, and particularly extreme ultraviolet (EUV) lithography, having a surface or "capping" layer which in combination with incident radiation and gaseous molecular species such as O.sub.2, H.sub.2, H.sub.2 O provides for continuous cleaning of carbon deposits from the optic surface. The metal capping layer is required to be oxidation resistant and capable of transmitting at least 90% of incident EUV radiation. Materials for the capping layer include Ru, Rh, Pd, Ir, Pt and Au and combinations thereof.

  20. Masks for high aspect ratio x-ray lithography

    SciTech Connect

    Malek, C.K.; Jackson, K.H.; Bonivert, W.D.; Hruby, J.

    1997-04-01

    Fabrication of very high aspect ratio microstructures, as well as ultra-high precision manufacturing is of increasing interest in a multitude of applications. Fields as diverse as micromechanics, robotics, integrated optics, and sensors benefit from this technology. The scale-length of this spatial regime is between what can be achieved using classical machine tool operations and that which is used in microelectronics. This requires new manufacturing techniques, such as the LIGA process, which combines x-ray lithography, electroforming, and plastic molding.

  1. Patterning of crystalline organic materials by electro-hydrodynamic lithography.

    PubMed

    Goldberg-Oppenheimer, Pola; Kohn, Peter; Langford, Richard M; Steiner, Ullrich

    2012-08-20

    The control of semi-crystalline polymers in thin films and in micrometer-sized patterns is attractive for (opto-)electronic applications. Electro-hydrodynamic lithography (EHL) enables the structure formation of organic crystalline materials on the micrometer length scale while at the same time exerting control over crystal orientation. This gives rise to well-defined micro-patterned arrays of uniaxially aligned polymer crystals. This study explores the interplay of EHL structure formation with crystal alignment and studies the mechanisms that give rise to crystal orientation in EHL-generated structures. PMID:22674540

  2. Advanced Life Systems for Extreme Environments: An Arctic Application

    NASA Technical Reports Server (NTRS)

    Lewis, Carol E.; Stanford, Kerry L.; Bubenheim, David L.; Covington, Alan (Technical Monitor)

    1995-01-01

    The problems of obtaining adequate pure drinking water and disposing of liquid and solid waste in the U.S. Arctic, a region where virtually all water is frozen solid for much of the year, has led to unsanitary solutions (U.S. Arctic Research Commission). These solutions are also damaging to the environment. Sanitation and a safe water supply are particularly problems in rural villages. About one-fourth of Alaska's 86.000 Native residents live in these communities. They are without running water and use plastic buckets for toilets. The outbreak of diseases is believed to be partially attributable to exposure to human waste. Villages with the most frequent outbreaks of disease are those in which running water is difficult to obtain (Office of Technology Assessment, 1994). Waste is emptied into open lagoons, rivers, or onto the sea coast. It does not degrade rapidly and in addition to affecting human health, can be harmful to the fragile ecology of the Arctic and the indigenous wildlife and fish populations. Advanced Life Systems for Extreme Environments (ALSEE) provides a solution to sanitation and safe water problems. The system uses an advanced integrated technology developed for Antarctic and space applications. ALSEE uses the systems approach to address more than waste and water problems. By incorporating hydroponic horticulture and aquaculture into the waste treatment system, ALSEE addresses the quality and quantity of fresh foods available to Arctic residents. A temperate climate is required for year-round plant growth. ALSEE facilities can be designed to include a climate controlled area within the structure. This type of environment is a change from the long periods of darkness and cold found in the Arctic and can help alleviate stress so often associated with these extremes. While the overall concept of ALSEE projects is advanced, system facilities can be operated by village residents with appropriate training. ALSEE provides continuing training and

  3. Recent advances and applications of probabilistic topic models

    NASA Astrophysics Data System (ADS)

    Wood, Ian

    2014-12-01

    I present here an overview of recent advances in probabilistic topic modelling and related Bayesian graphical models as well as some of their more atypical applications outside of their home: text analysis. These techniques allow the modelling of high dimensional count vectors with strong correlations. With such data, simply calculating a correlation matrix is infeasible. Probabilistic topic models address this using mixtures of multinomials estimated via Bayesian inference with Dirichlet priors. The use of conjugate priors allows for efficient inference, and these techniques scale well to data sets with many millions of vectors. The first of these techniques to attract significant attention was Latent Dirichlet Allocation (LDA) [1, 2]. Numerous extensions and adaptations of LDA have been proposed: non-parametric models; assorted models incorporating authors, sentiment and other features; models regularised through the use of extra metadata or extra priors on topic structure, and many more [3]. They have become widely used in the text analysis and population genetics communities, with a number of compelling applications. These techniques are not restricted to text analysis, however, and can be applied to other types of data which can be sensibly discretised and represented as counts of labels/properties/etc. LDA and it's variants have been used to find patterns in data from diverse areas of inquiry, including genetics, plant physiology, image analysis, social network analysis, remote sensing and astrophysics. Nonetheless, it is relatively recently that probabilistic topic models have found applications outside of text analysis, and to date few such applications have been considered. I suggest that there is substantial untapped potential for topic models and models inspired by or incorporating topic models to be fruitfully applied, and outline the characteristics of systems and data for which this may be the case.

  4. Lithography and design in partnership: a new roadmap

    NASA Astrophysics Data System (ADS)

    Kahng, Andrew B.

    2008-10-01

    We discuss the notion of a 'shared technology roadmap' between lithography and design from several perspectives. First, we examine cultural gaps and other intrinsic barriers to a shared roadmap. Second, we discuss how lithography technology can change the design technology roadmap. Third, we discuss how design technology can change the lithography technology roadmap. We conclude with an example of the 'flavor' of technology roadmapping activity that can truly bridge lithography and design.

  5. Recent Advances in Biosensor Technology for Potential Applications - An Overview.

    PubMed

    Vigneshvar, S; Sudhakumari, C C; Senthilkumaran, Balasubramanian; Prakash, Hridayesh

    2016-01-01

    Imperative utilization of biosensors has acquired paramount importance in the field of drug discovery, biomedicine, food safety standards, defense, security, and environmental monitoring. This has led to the invention of precise and powerful analytical tools using biological sensing element as biosensor. Glucometers utilizing the strategy of electrochemical detection of oxygen or hydrogen peroxide using immobilized glucose oxidase electrode seeded the discovery of biosensors. Recent advances in biological techniques and instrumentation involving fluorescence tag to nanomaterials have increased the sensitive limit of biosensors. Use of aptamers or nucleotides, affibodies, peptide arrays, and molecule imprinted polymers provide tools to develop innovative biosensors over classical methods. Integrated approaches provided a better perspective for developing specific and sensitive biosensors with high regenerative potentials. Various biosensors ranging from nanomaterials, polymers to microbes have wider potential applications. It is quite important to integrate multifaceted approaches to design biosensors that have the potential for diverse usage. In light of this, this review provides an overview of different types of biosensors being used ranging from electrochemical, fluorescence tagged, nanomaterials, silica or quartz, and microbes for various biomedical and environmental applications with future outlook of biosensor technology. PMID:26909346

  6. Artificial placenta: Recent advances and potential clinical applications.

    PubMed

    Metelo-Coimbra, Catarina; Roncon-Albuquerque, Roberto

    2016-06-01

    Lung immaturity remains a major cause of morbidity and mortality in extremely premature infants. Positive-pressure mechanical ventilation, the method of choice for respiratory support in premature infants, frequently promotes by itself lung injury and a negative impact in the circulatory function. Extracorporeal lung support has been proposed for more than 50 years as a potential alternative to mechanical ventilation in the treatment of severe respiratory failure of extremely premature infants. Recent advances in this field included the development of miniaturized centrifugal pumps and polymethylpentene oxygenators, as well as the successful use of pump-assisted veno-venous extracorporeal gas exchange systems in experimental artificial placenta models. This review, which includes studies published from 1958 to 2015, presents an update on the artificial placenta concept and its potential clinical applications. Special focus will be devoted to the milestones achieved so far and to the limitations that must be overcome before its clinical application. Notwithstanding, the artificial placenta stands as a promising alternative to mechanical ventilation in extremely premature infants. Pediatr Pulmonol. 2016;51:643-649. © 2016 Wiley Periodicals, Inc.

  7. Stimulus-responsive hydrogels: Theory, modern advances, and applications

    PubMed Central

    Koetting, Michael C.; Peters, Jonathan T.; Steichen, Stephanie D.; Peppas, Nicholas A.

    2016-01-01

    Over the past century, hydrogels have emerged as effective materials for an immense variety of applications. The unique network structure of hydrogels enables very high levels of hydrophilicity and biocompatibility, while at the same time exhibiting the soft physical properties associated with living tissue, making them ideal biomaterials. Stimulus-responsive hydrogels have been especially impactful, allowing for unprecedented levels of control over material properties in response to external cues. This enhanced control has enabled groundbreaking advances in healthcare, allowing for more effective treatment of a vast array of diseases and improved approaches for tissue engineering and wound healing. In this extensive review, we identify and discuss the multitude of response modalities that have been developed, including temperature, pH, chemical, light, electro, and shear-sensitive hydrogels. We discuss the theoretical analysis of hydrogel properties and the mechanisms used to create these responses, highlighting both the pioneering and most recent work in all of these fields. Finally, we review the many current and proposed applications of these hydrogels in medicine and industry. PMID:27134415

  8. Advanced fuel cells for transportation applications. Final report

    SciTech Connect

    1998-02-10

    This Research and Development (R and D) contract was directed at developing an advanced technology compressor/expander for supplying compressed air to Proton Exchange Membrane (PEM) fuel cells in transportation applications. The objective of this project was to develop a low-cost high-efficiency long-life lubrication-free integrated compressor/expander utilizing scroll technology. The goal of this compressor/expander was to be capable of providing compressed air over the flow and pressure ranges required for the operation of 50 kW PEM fuel cells in transportation applications. The desired ranges of flow, pressure, and other performance parameters were outlined in a set of guidelines provided by DOE. The project consisted of the design, fabrication, and test of a prototype compressor/expander module. The scroll CEM development program summarized in this report has been very successful, demonstrating that scroll technology is a leading candidate for automotive fuel cell compressor/expanders. The objectives of the program are: develop an integrated scroll CEM; demonstrate efficiency and capacity goals; demonstrate manufacturability and cost goals; and evaluate operating envelope. In summary, while the scroll CEM program did not demonstrate a level of performance as high as the DOE guidelines in all cases, it did meet the overriding objectives of the program. A fully-integrated, low-cost CEM was developed that demonstrated high efficiency and reliable operation throughout the test program. 26 figs., 13 tabs.

  9. Recent Advances in Biosensor Technology for Potential Applications - An Overview.

    PubMed

    Vigneshvar, S; Sudhakumari, C C; Senthilkumaran, Balasubramanian; Prakash, Hridayesh

    2016-01-01

    Imperative utilization of biosensors has acquired paramount importance in the field of drug discovery, biomedicine, food safety standards, defense, security, and environmental monitoring. This has led to the invention of precise and powerful analytical tools using biological sensing element as biosensor. Glucometers utilizing the strategy of electrochemical detection of oxygen or hydrogen peroxide using immobilized glucose oxidase electrode seeded the discovery of biosensors. Recent advances in biological techniques and instrumentation involving fluorescence tag to nanomaterials have increased the sensitive limit of biosensors. Use of aptamers or nucleotides, affibodies, peptide arrays, and molecule imprinted polymers provide tools to develop innovative biosensors over classical methods. Integrated approaches provided a better perspective for developing specific and sensitive biosensors with high regenerative potentials. Various biosensors ranging from nanomaterials, polymers to microbes have wider potential applications. It is quite important to integrate multifaceted approaches to design biosensors that have the potential for diverse usage. In light of this, this review provides an overview of different types of biosensors being used ranging from electrochemical, fluorescence tagged, nanomaterials, silica or quartz, and microbes for various biomedical and environmental applications with future outlook of biosensor technology.

  10. Note: fabrication of a simple versatile micro-positioning setup for automated soft lithography.

    PubMed

    Hautefeuille, M; Cortes, J G Lopez; Alfaro, M C Ortega; Castro, M P Carreon; Velazquez, V

    2011-11-01

    In this note, we report the simple development of a homemade versatile device that allows micrometric vertical micro-positioning for computer-controlled dip-coating thin film deposition and micro-contact printing capabilities. Using mostly recycled parts, the resulting low-cost setup offers great precision, ease of use, and portability while complying with common soft lithography technique's specifications. It results in an excellent benchtop alternative to more expensive commercial solutions or more complex custom soft lithography devices, especially for organic electronics and quantum optics applications.

  11. Self-aligned grating couplers on template-stripped metal pyramids via nanostencil lithography

    NASA Astrophysics Data System (ADS)

    Klemme, Daniel J.; Johnson, Timothy W.; Mohr, Daniel A.; Oh, Sang-Hyun

    2016-05-01

    We combine nanostencil lithography and template stripping to create self-aligned patterns about the apex of ultrasmooth metal pyramids with high throughput. Three-dimensional patterns such as spiral and asymmetric linear gratings, which can couple incident light into a hot spot at the tip, are presented as examples of this fabrication method. Computer simulations demonstrate that spiral and linear diffraction grating patterns are both effective at coupling light to the tip. The self-aligned stencil lithography technique can be useful for integrating plasmonic couplers with sharp metallic tips for applications such as near-field optical spectroscopy, tip-based optical trapping, plasmonic sensing, and heat-assisted magnetic recording.

  12. Submicrometer photonic structure fabrication by phase spatial-light-modulator-based interference lithography.

    PubMed

    Behera, Saraswati; Kumar, Manish; Joseph, Joby

    2016-04-15

    We present a large-area and single-step fabrication approach based on phase spatial light modulator (SLM)-assisted interference lithography for the realization of submicrometer photonic structures on photoresist. A multimirror beam steering unit is used to reflect the SLM-generated phase-engineered beams leading to a large angle between interfering beams while also preserving the large area of the interfering plane beams. Both translational and rotational periodic submicrometer structures are experimentally realized. This approach increases the flexibility of interference lithography to fabricate more complex submicrometer photonic structures and photonic metamaterial structures for future applications. PMID:27082372

  13. Fabrication of moth-eye structures on silicon by direct six-beam laser interference lithography

    NASA Astrophysics Data System (ADS)

    Xu, Jia; Wang, Zuobin; Zhang, Ziang; Wang, Dapeng; Weng, Zhankun

    2014-05-01

    This paper presents a new method for the generation of cross-scale laser interference patterns and the fabrication of moth-eye structures on silicon. In the method, moth-eye structures were produced on a surface of silicon wafer using direct six-beam laser interference lithography to improve the antireflection performance of the material surface. The periodic dot arrays of the moth-eye structures were formed due to the ablation of the irradiance distribution of interference patterns on the wafer surface. The shape, size, and distribution of the moth-eye structures can be adjusted by controlling the wavelength, incidence angles, and exposure doses in a direct six-beam laser interference lithography setup. The theoretical and experimental results have shown that direct six-beam laser interference lithography can provide a way to fabricate cross-scale moth-eye structures for antireflection applications.

  14. Fabrication of moth-eye structures on silicon by direct six-beam laser interference lithography

    SciTech Connect

    Xu, Jia; Zhang, Ziang; Weng, Zhankun; Wang, Zuobin Wang, Dapeng

    2014-05-28

    This paper presents a new method for the generation of cross-scale laser interference patterns and the fabrication of moth-eye structures on silicon. In the method, moth-eye structures were produced on a surface of silicon wafer using direct six-beam laser interference lithography to improve the antireflection performance of the material surface. The periodic dot arrays of the moth-eye structures were formed due to the ablation of the irradiance distribution of interference patterns on the wafer surface. The shape, size, and distribution of the moth-eye structures can be adjusted by controlling the wavelength, incidence angles, and exposure doses in a direct six-beam laser interference lithography setup. The theoretical and experimental results have shown that direct six-beam laser interference lithography can provide a way to fabricate cross-scale moth-eye structures for antireflection applications.

  15. Cost of ownership analysis for patterning using step and flash imprint lithography

    NASA Astrophysics Data System (ADS)

    Sreenivasan, S. V.; Willson, C. Grant; Schumaker, Norman E.; Resnick, Douglas J.

    2002-07-01

    While the critical dimension in the microelectronics industry is continually going down due to developments in photolithography, it is coming at the expense of exponential increase in lithography tool costs and rising photomask costs. Step and Flash Imprint Lithography (S-FIL) is a nano-patterning technique that results in significantly lower cost of the lithography tool and process consumables. In this study, a comparison of S-FIL with Extreme Ultraviolet (EUV) photolithography technique is provided at the 50nm node. Advantages and disadvantages of S-FIL for various application sectors are provided. Finally, cost of ownership (CoO) computations of S-FIL versus EUV is provided. CoO computations indicate that S-FIL may be the cost-effective technology in the sub-100nm domain, particularly for emerging devices that are required in low volumes.

  16. Advanced gas engine cogeneration technology for special applications

    SciTech Connect

    Plohberger, D.C.; Fessl, T.; Gruber, F.; Herdin, G.R.

    1995-10-01

    In recent years gas Otto-cycle engines have become common for various applications in the field of power and heat generation. Gas engines are chosen sometimes even to replace diesel engines, because of their clean exhaust emission characteristics and the ample availability of natural gas in the world. The Austrian Jenbacher Energie Systeme AG has been producing gas engines in the range of 300 to 1,600 kW since 1960. The product program covers state-of-the-art natural gas engines as well as advanced applications for a wide range of alterative gas fuels with emission levels comparable to Low Emission (LEV) and Ultra Low Emission Vehicle (ULEV) standards. In recent times the demand for special cogeneration applications is rising. For example, a turnkey cogeneration power plant for a total 14.4 MW electric power and heat output consisting of four JMS616-GSNLC/B spark-fired gas engines specially tuned for high altitude operation has been delivered to the well-known European ski resort of Sestriere. Sestriere is situated in the Italian Alps at an altitude of more than 2,000 m above sea level. The engines feature a turbocharging system tuned to an ambient air pressure of only 80 kPa to provide an output and efficiency of each 1.6 MW and up to 40% {at} 1,500 rpm, respectively. The ever-increasing demand for lower pollutant emissions in the US and some European countries initiates developments in new exhaust aftertreatment technologies. Thermal reactor and Selective Catalytic Reduction (SCR) systems are used to reduce tailpipe CO and NO{sub x} emissions of engines. Both SCR and thermal reactor technology will shift the engine tuning to achieve maximum efficiency and power output. Development results are presented, featuring the ultra low emission potential of biogas and natural gas engines with exhaust aftertreatment.

  17. Applications and advances of positron beam spectroscopy: appendix a

    SciTech Connect

    Howell, R. H., LLNL

    1997-11-05

    Over 50 scientists from DOE-DP, DOE-ER, the national laboratories, academia and industry attended a workshop held on November 5-7, 1997 at Lawrence Livermore National Laboratory jointly sponsored by the DOE-Division of Materials Science, The Materials Research Institute at LLNL and the University of California Presidents Office. Workshop participants were charged to address two questions: Is there a need for a national center for materials analysis using positron techniques and can the capabilities at Lawrence Livermore National Laboratory serve this need. To demonstrate the need for a national center the workshop participants discussed the technical advantages enabled by high positron currents and advanced measurement techniques, the role that these techniques will play in materials analysis and the demand for the data. There were general discussions lead by review talks on positron analysis techniques, and their applications to problems in semiconductors, polymers and composites, metals and engineering materials, surface analysis and advanced techniques. These were followed by focus sessions on positron analysis opportunities in these same areas. Livermore now leads the world in materials analysis capabilities by positrons due to developments in response to demands of science based stockpile stewardship. There was a detailed discussion of the LLNL capabilities and a tour of the facilities. The Livermore facilities now include the worlds highest current beam of keV positrons, a scanning pulsed positron microprobe under development capable of three dimensional maps of defect size and concentration, an MeV positron beam for defect analysis of large samples, and electron momentum spectroscopy by positrons. This document is a supplement to the written summary report. It contains a complete schedule, list of attendees and the vuegraphs for the presentations in the review and focus sessions.

  18. Advanced Health Management Algorithms for Crew Exploration Applications

    NASA Technical Reports Server (NTRS)

    Davidson, Matt; Stephens, John; Jones, Judit

    2005-01-01

    Achieving the goals of the President's Vision for Exploration will require new and innovative ways to achieve reliability increases of key systems and sub-systems. The most prominent approach used in current systems is to maintain hardware redundancy. This imposes constraints to the system and utilizes weight that could be used for payload for extended lunar, Martian, or other deep space missions. A technique to improve reliability while reducing the system weight and constraints is through the use of an Advanced Health Management System (AHMS). This system contains diagnostic algorithms and decision logic to mitigate or minimize the impact of system anomalies on propulsion system performance throughout the powered flight regime. The purposes of the AHMS are to increase the probability of successfully placing the vehicle into the intended orbit (Earth, Lunar, or Martian escape trajectory), increase the probability of being able to safely execute an abort after it has developed anomalous performance during launch or ascent phases of the mission, and to minimize or mitigate anomalies during the cruise portion of the mission. This is accomplished by improving the knowledge of the state of the propulsion system operation at any given turbomachinery vibration protection logic and an overall system analysis algorithm that utilizes an underlying physical model and a wide array of engine system operational parameters to detect and mitigate predefined engine anomalies. These algorithms are generic enough to be utilized on any propulsion system yet can be easily tailored to each application by changing input data and engine specific parameters. The key to the advancement of such a system is the verification of the algorithms. These algorithms will be validated through the use of a database of nominal and anomalous performance from a large propulsion system where data exists for catastrophic and noncatastrophic propulsion sytem failures.

  19. Extreme Ultraviolet Lithography - Reflective Mask Technology

    SciTech Connect

    Walton, C.C.; Kearney, P.A.; Mirkarimi, P.B.; Bowers, J.M.; Cerjan, C.; Warrick, A.L.; Wilhelmsen, K.; Fought, E.; Moore, C.; Larson, C.; Baker, S.; Burkhart, S.C.; Hector, S.D.

    2000-05-09

    EUVL mask blanks consist of a distributed Bragg reflector made of 6.7nm-pitch bi-layers of MO and Si deposited upon a precision Si or glass substrate. The layer deposition process has been optimized for low defects, by application of a vendor-supplied but highly modified ion-beam sputter deposition system. This system is fully automated using SMIF technology to obtain the lowest possible environmental- and handling-added defect levels. Originally designed to coat 150mm substrates, it was upgraded in July, 1999 to 200 mm and has coated runs of over 50 substrates at a time with median added defects >100nm below 0.05/cm{sup 2}. These improvements have resulted from a number of ion-beam sputter deposition system modifications, upgrades, and operational changes, which will be discussed. Success in defect reduction is highly dependent upon defect detection, characterization, and cross-platform positional registration. We have made significant progress in adapting and extending commercial tools to this purpose, and have identified the surface scanner detection limits for different defect classes, and the signatures of false counts and non-printable scattering anomalies on the mask blank. We will present key results and how they have helped reduce added defects. The physics of defect reduction and mitigation is being investigated by a program on multilayer growth over deliberately placed perturbations (defects) of varying size. This program includes modeling of multilayer growth and modeling of defect printability. We developed a technique for depositing uniformly sized gold spheres on EUVL substrates, and have studied the suppression of the perturbations during multilayer growth under varying conditions. This work is key to determining the lower limit of critical defect size for EUV Lithography. We present key aspects of this work. We will summarize progress in all aspects of EUVL mask blank development, and present detailed results on defect reduction and mask blank

  20. Double-Sided Opportunities Using Chemical Lift-Off Lithography.

    PubMed

    Andrews, Anne M; Liao, Wei-Ssu; Weiss, Paul S

    2016-08-16

    We discuss the origins, motivation, invention, development, applications, and future of chemical lift-off lithography, in which a specified pattern of a self-assembled monolayer is removed, i.e., lifted off, using a reactive, patterned stamp that is brought into contact with the monolayer. For Au substrates, this process produces a supported, patterned monolayer of Au on the stamp in addition to the negative pattern in the original molecular monolayer. Both the patterned molecular monolayer on the original substrate and the patterned supported metal monolayer on the stamp are useful as materials and for further applications in sensing and other areas. Chemical lift-off lithography effectively lowers the barriers to and costs of high-resolution, large-area nanopatterning. On the patterned monolayer side, features in the single-nanometer range can be produced across large (square millimeter or larger) areas. Patterns smaller than the original stamp feature sizes can be produced by controlling the degree of contact between the stamp and the lifted-off monolayer. We note that this process is different than conventional lift-off processes in lithography in that chemical lift-off lithography removes material, whereas conventional lift-off is a positive-tone patterning method. Chemical lift-off lithography is in some ways similar to microtransfer printing. Chemical lift-off lithography has critical advantages in the preparation of biocapture surfaces because the molecules left behind are exploited to space and to orient functional(ized) molecules. On the supported metal monolayer side, a new two-dimensional material has been produced. The useful important chemical properties of Au (vis-à-vis functionalization with thiols) are retained, but the electronic and optical properties of bulk Au or even Au nanoparticles are not. These metal monolayers do not quench excitation and may be useful in optical measurements, particularly in combination with selective binding due to

  1. Double-Sided Opportunities Using Chemical Lift-Off Lithography.

    PubMed

    Andrews, Anne M; Liao, Wei-Ssu; Weiss, Paul S

    2016-08-16

    We discuss the origins, motivation, invention, development, applications, and future of chemical lift-off lithography, in which a specified pattern of a self-assembled monolayer is removed, i.e., lifted off, using a reactive, patterned stamp that is brought into contact with the monolayer. For Au substrates, this process produces a supported, patterned monolayer of Au on the stamp in addition to the negative pattern in the original molecular monolayer. Both the patterned molecular monolayer on the original substrate and the patterned supported metal monolayer on the stamp are useful as materials and for further applications in sensing and other areas. Chemical lift-off lithography effectively lowers the barriers to and costs of high-resolution, large-area nanopatterning. On the patterned monolayer side, features in the single-nanometer range can be produced across large (square millimeter or larger) areas. Patterns smaller than the original stamp feature sizes can be produced by controlling the degree of contact between the stamp and the lifted-off monolayer. We note that this process is different than conventional lift-off processes in lithography in that chemical lift-off lithography removes material, whereas conventional lift-off is a positive-tone patterning method. Chemical lift-off lithography is in some ways similar to microtransfer printing. Chemical lift-off lithography has critical advantages in the preparation of biocapture surfaces because the molecules left behind are exploited to space and to orient functional(ized) molecules. On the supported metal monolayer side, a new two-dimensional material has been produced. The useful important chemical properties of Au (vis-à-vis functionalization with thiols) are retained, but the electronic and optical properties of bulk Au or even Au nanoparticles are not. These metal monolayers do not quench excitation and may be useful in optical measurements, particularly in combination with selective binding due to

  2. Study of the application of advanced technologies to long range transport aircraft. Volume 2: Advanced technology program recommendations

    NASA Technical Reports Server (NTRS)

    1972-01-01

    The benefits of the application of advanced technology to future transport aircraft were investigated. The noise reduction goals established by the CARD (Civil Aviation Research and Development) study for the 1981-1985 time period can be satisfied. Reduced terminal area and airway congestion can result from use of advanced on-board systems and operating procedures. The use of advanced structural design concepts can result in greatly reduced gross weight and improved operating economics. The full potential of these benefits can be realized in a 1985 airplane by implementing a research and development program that is funded to an average level of approximately $55 million per year over a ten year period.

  3. Investigation of Glass Polycapillaries for Use in Proximity X-Ray Lithography.

    NASA Astrophysics Data System (ADS)

    Klotzko, Ira L.

    developers claim that as line widths in circuits are reduced to 0.18 mum, x-ray optics, specifically a collimator, will be needed to produce the required beam characteristics^6. Among a number of designs, arrays of glass polycapillary fibers have the potential of controlling parameters important to point -source lithography. The high absorption of x-rays by air at energies less than 3 keV necessitates the development of such a collimator be done in an atmosphere such as helium or vacuum. Consequently, there has been little research done at energies of 3 keV or lower. An experimental setup that tests glass capillary fibers under such conditions has been developed. It has sufficiently long optical paths in the vacuum chamber to be useful in evaluating the parameters critical for semiconductor lithography. Experimental and simulated transmission characteristics of polycapillary fibers have been studied at 1 keV.^7 Using this data, a collimator has been developed which will help determine the feasibility of using polycapillary optics for point-source-x-ray lithography. ftn ^1Semiconductor Industry Association, The National Technology Roadmap for Semiconductors, p.87 (1994). ^2Semiconductor International, Feb. (1996). ^3H. Loschner, Proc. SPIE 2194, p. 384 (1994). ^4R. Bojko, Proc. SPIE 1924, p. 214 (1993). ^5L. Liebmann, Proc. SPIE 2194, p. 51 (1994). ^6J. Abate, Advanced Lithography Program, Point Source Collimation Workshop II, Scottsdale AZ (1995). ^7I. Klotzko, Proc. SPIE 2523, p. 174 (1994).

  4. Evaluation of Metal Absorber Materials for Beyond Extreme Ultraviolet Lithography.

    PubMed

    Hong, Seongchul; Kim, Jung Sik; Lee, Jae Uk; Lee, Seung Min; Kim, Jung Hwan; Ahn, Jinho

    2015-11-01

    In addition to the development of extreme ultraviolet lithography (EUVL), studies on beyond extreme ultraviolet lithography (BEUVL), which uses radiation with a wavelength of 6.7 nm, are in progress for their application in high-volume manufacturing. The BEUV wavelength, which is much shorter than the EUV wavelength, improves the resolution of patterned features. However, suitable materials for the mask stack of BEUVL are still under development. In this study, the applicability of metallic materials, such as Ni, Co, Ir, W, and Ta, as the absorber in a binary-intensity BEUVL mask was evaluated. The mask-imaging properties were simulated by adopting a thickness that ensured a reflectivity of <1% for each material. Furthermore, we used a multilayered La/B mirror--which exhibited a high reflectivity at a wavelength of 6.7 nm--because BEUV light is absorbed by most materials, and therefore uses reflective optics as desired. The numerical aperture (NA), angle of incidence, and demagnification factor were 0.5 and 0.6, 6 degrees, and 8x, respectively. We confirmed that a line-and-space pattern with a half-pitch of 11 nm can be patterned with metallic absorbers by using a high NA. PMID:26726569

  5. Evaluation of Metal Absorber Materials for Beyond Extreme Ultraviolet Lithography.

    PubMed

    Hong, Seongchul; Kim, Jung Sik; Lee, Jae Uk; Lee, Seung Min; Kim, Jung Hwan; Ahn, Jinho

    2015-11-01

    In addition to the development of extreme ultraviolet lithography (EUVL), studies on beyond extreme ultraviolet lithography (BEUVL), which uses radiation with a wavelength of 6.7 nm, are in progress for their application in high-volume manufacturing. The BEUV wavelength, which is much shorter than the EUV wavelength, improves the resolution of patterned features. However, suitable materials for the mask stack of BEUVL are still under development. In this study, the applicability of metallic materials, such as Ni, Co, Ir, W, and Ta, as the absorber in a binary-intensity BEUVL mask was evaluated. The mask-imaging properties were simulated by adopting a thickness that ensured a reflectivity of <1% for each material. Furthermore, we used a multilayered La/B mirror--which exhibited a high reflectivity at a wavelength of 6.7 nm--because BEUV light is absorbed by most materials, and therefore uses reflective optics as desired. The numerical aperture (NA), angle of incidence, and demagnification factor were 0.5 and 0.6, 6 degrees, and 8x, respectively. We confirmed that a line-and-space pattern with a half-pitch of 11 nm can be patterned with metallic absorbers by using a high NA.

  6. Functional polymers by two-photon 3D lithography

    NASA Astrophysics Data System (ADS)

    Infuehr, Robert; Pucher, Niklas; Heller, Christian; Lichtenegger, Helga; Liska, Robert; Schmidt, Volker; Kuna, Ladislav; Haase, Anja; Stampfl, Jürgen

    2007-12-01

    In the presented work, two-photon 3D lithography and selective single-photon photopolymerization in a prefabricated polydimethylsiloxane matrix is presented as an approach with potential applicability of waveguide writing in 3D by two-photon polymerization. Photopolymers based on acrylate chemistry were used in order to evaluate the optical capabilities of the available two-photon system. Several photoinitiators, tailored for two-photon absorption, were tested in a mixture of trimethylolpropane triacrylate and ethoxylated trimethylolpropane triacrylate. Best results were obtained with a recently synthesized diynone-based photoinitiator. Feature resolutions in the range of 300 nm were achieved. Due to the cross-conjugated nature of that donor-π-acceptor-π-donor system a high two-photon absorption activity was achieved. Therefore, a resin mixture containing only 0.025 wt% of photoinitiator was practical for structuring by two-photon polymerization. The required initiator content was therefore a factor of 100 lower than in traditional one-photon lithography. The aim of the second part of this work was to fabricate optical waveguides by selectively irradiating a polymer network, which was swollen by a monomer. The monomer was polymerized by conventional single-photon polymerization and the uncured monomer was removed by evaporation at elevated temperatures. This treatment leads to a local change in refractive index. Refractive index changes in the range of Δ n = 0.01 (Δ n/ n = 0.7%) were achieved, which is sufficient for structuring waveguides for optoelectronic applications.

  7. Large area patterning using interference and nanoimprint lithography

    NASA Astrophysics Data System (ADS)

    Bläsi, B.; Tucher, N.; Höhn, O.; Kübler, V.; Kroyer, T.; Wellens, Ch.; Hauser, H.

    2016-04-01

    Interference lithography (IL) is the best suited technology for the origination of large area master structures with high resolution. In prior works, we seamlessly pattern areas of up to 1.2 x 1.2 m2 with periodic features, i.e. a diffraction grating with a period in the micron range. For this process we use an argon ion laser emitting at 363.8 nm. Thus, feasible periods are in the range of 100 μm to 200 nm. Edge-defined techniques or also called (self-aligned) double patterning processes can be used to double the spatial frequency of such structures. This way, we aim to reduce achievable periods further down to 100 nm. In order to replicate master structures, we make use of nanoimprint lithography (NIL) processes. In this work, we present results using IL as mastering and NIL as replication technology in the fields of photovoltaics as well as display and lighting applications. In photovoltaics different concepts like the micron-scale patterning of the front side as well as the realization of rear side diffraction gratings are presented. The benefit for each is shown on final device level. In the context of display and lighting applications, we realized various structures ranging from designed, symmetric or asymmetric, diffusers, antireflective and/or antiglare structures, polarization optical elements (wire grid polarizers), light guidance and light outcoupling structures.

  8. High speed e-beam lithography for gold nanoarray fabrication and use in nanotechnology

    PubMed Central

    François, Marc; Romijn, Hans; Codron, Jean-Louis; Vuillaume, Dominique; Théron, Didier; Clément, Nicolas

    2014-01-01

    Summary E-beam lithography has been used for reliable and versatile fabrication of sub-15 nm single-crystal gold nanoarrays and led to convincing applications in nanotechnology. However, so far this technique was either too slow for centimeter to wafer-scale writing or fast enough with the so-called dot on the fly (DOTF) technique but not optimized for sub-15 nm dots dimension. This prevents use of this technology for some applications and characterization techniques. Here, we show that the DOTF technique can be used without degradation in dots dimension. In addition, we propose two other techniques. The first one is an advanced conventional technique that goes five times faster than the conventional one. The second one relies on sequences defined before writing which enable versatility in e-beam patterns compared to the DOTF technique with same writing speed. By comparing the four different techniques, we evidence the limiting parameters for the writing speed. Wafer-scale fabrication of such arrays with 50 nm pitch allowed XPS analysis of a ferrocenylalkyl thiol self-assembled monolayer coated gold nanoarray. PMID:25383303

  9. Sloped irradiation techniques in deep x-ray lithography for 3D shaping of microstructures

    NASA Astrophysics Data System (ADS)

    Feiertag, Gregor; Ehrfeld, Wolfgang; Lehr, Heinz; Schmidt, Martin

    1997-07-01

    Deep x-ray lithography (DXRL) makes use of synchrotron radiation (SR) to transfer an absorber pattern from a mask into a thick resist layer. For most applications the direction of the SR beam is perpendicular to the mask and the resist plane. Subsequent replication techniques, e.g. electroforming, moulding or hot embossing, convert the resist relief obtained after development into micromechanical, microfluidic or micro- optical elements made from metals, polymers or ceramic materials. This process sequence is well known as the LIGA technique. The normal shadow printing process is complemented and enhanced by advanced techniques, e.g. by tilting the mask and the resist with respect to the SR beam or aligned multiple exposures to produce step-like structures. In this paper a technology for the fabrication of multidirectional inclined microstructures applying multiple tilted DXRL will be presented. Instead of one exposure with the mask/substrate assembly perpendicular to the SR beam, irradiation is performed several times applying tilt and rotational angles of the mask/substrate assembly relative to the SR beam. A huge variety of 3-D structures can be obtained using this technique. Some possible applications will be discussed.

  10. Ground-to-orbit laser propulsion: Advanced applications

    NASA Technical Reports Server (NTRS)

    Kare, Jordin T.

    1990-01-01

    Laser propulsion uses a large fixed laser to supply energy to heat an inert propellant in a rocket thruster. Such a system has two potential advantages: extreme simplicity of the thruster, and potentially high performance, particularly high exhaust velocity. By taking advantage of the simplicity of the thruster, it should be possible to launch small (10 to 1000 kg) payloads to orbit using roughly 1 MW of average laser power per kg of payload. The incremental cost of such launches would be of an order of $200/kg for the smallest systems, decreasing to essentially the cost of electricity to run the laser (a few times $10/kg) for larger systems. Although the individual payload size would be smaller, a laser launch system would be inherently high-volume, with the capacity to launch tens of thousands of payloads per year. Also, with high exhaust velocity, a laser launch system could launch payloads to high velocities - geosynchronous transfer, Earth escape, or beyond - at a relatively small premium over launches to LEO. The status of pulsed laser propulsion is briefly reviewed including proposals for advanced vehicles. Several applications appropriate to the early part of the next century and perhaps valuable well into the next millennium are discussed qualitatively: space habitat supply, deep space mission supply, nuclear waste disposal, and manned vehicle launching.

  11. Tandem Fan Applications in Advanced STOVL Fighter Configurations

    NASA Technical Reports Server (NTRS)

    Zola, Charlse L.; Wilson, Samuel B., III; Eskey, Megan A.

    1984-01-01

    The series/parallel tandem fan engine is evaluated for application in advanced STOVL supersonic fighter aircraft. Options in engine cycle parameters and design of the front fan flow diverter are examined for their effects on engine weight, dimensions, and other factors in integration of the engine with the aircraft. Operation of the engine in high-bypass flow mode during cruise and loiter flight is considered as a means of minimizizng fuel consumption. Engine thrust augmentation by burning in the front fan exhaust is discussed. Achievement of very sort takeoff with vectored thrust in briefly reviewed for tandem fan engine configurations with vectorable front fan nozzles. Examples are given of two aircraft configuration planforms, a delta-canard, and a forward-swept wing, to illustrate the major features. design considerations, and potential performance of the tandem fan installation in each. Full realization of the advantages of tandem fan propulsion are found to depend on careful selection of the aircraft configuration, since integration requirements can strongly influence the engine performance.

  12. Engineering derivatives from biological systems for advanced aerospace applications

    NASA Technical Reports Server (NTRS)

    Winfield, Daniel L.; Hering, Dean H.; Cole, David

    1991-01-01

    The present study consisted of a literature survey, a survey of researchers, and a workshop on bionics. These tasks produced an extensive annotated bibliography of bionics research (282 citations), a directory of bionics researchers, and a workshop report on specific bionics research topics applicable to space technology. These deliverables are included as Appendix A, Appendix B, and Section 5.0, respectively. To provide organization to this highly interdisciplinary field and to serve as a guide for interested researchers, we have also prepared a taxonomy or classification of the various subelements of natural engineering systems. Finally, we have synthesized the results of the various components of this study into a discussion of the most promising opportunities for accelerated research, seeking solutions which apply engineering principles from natural systems to advanced aerospace problems. A discussion of opportunities within the areas of materials, structures, sensors, information processing, robotics, autonomous systems, life support systems, and aeronautics is given. Following the conclusions are six discipline summaries that highlight the potential benefits of research in these areas for NASA's space technology programs.

  13. Advances in laser-based isotope ratio measurements: selected applications

    NASA Astrophysics Data System (ADS)

    Kerstel, E.; Gianfrani, L.

    2008-09-01

    Small molecules exhibit characteristic ro-vibrational transitions in the near- and mid-infrared spectral regions, which are strongly influenced by isotopic substitution. This gift of nature has made it possible to use laser spectroscopy for the accurate analysis of the isotopic composition of gaseous samples. Nowadays, laser spectroscopy is clearly recognized as a valid alternative to isotope ratio mass spectrometry. Laser-based instruments are leaving the research laboratory stage and are being used by a growing number of isotope researchers for significant advances in their own field of research. In this review article, we discuss the current status and new frontiers of research on high-sensitivity and high-precision laser spectroscopy for isotope ratio analyses. Although many of our comments will be generally applicable to laser isotope ratio analyses in molecules of environmental importance, this paper concerns itself primarily with water and carbon dioxide, two molecules that were studied extensively in our respective laboratories. A complete coverage of the field is practically not feasible in the space constraints of this issue, and in any case doomed to fail, considering the large body of work that has appeared ever since the review by Kerstel in 2004 ( Handbook of Stable Isotope Analytical Techniques, Chapt. 34, pp. 759-787).

  14. Advanced Turbine Technology Applications Project (ATTAP) 1993 annual report

    NASA Technical Reports Server (NTRS)

    1994-01-01

    This report summarizes work performed by AlliedSignal Engines, a unit of AlliedSignal Aerospace Company, during calendar year 1993, toward development and demonstration of structural ceramic technology for automotive gas turbine engines. This work was performed for the U.S. Department of Energy (DOE) under National Aeronautics and Space Administration (NASA) Contract DEN3-335, Advanced Turbine Technology Applications Project (ATFAP). During 1993, the test bed used to demonstrate ceramic technology was changed from the AlliedSignal Engines/Garrett Model AGT101 regenerated gas turbine engine to the Model 331-200(CT) engine. The 331-200(CT) ceramic demonstrator is a fully-developed test platform based on the existing production AlliedSignal 331-200(ER) gas turbine auxiliary power unit (APU), and is well suited to evaluating ceramic turbine blades and nozzles. In addition, commonality of the 331-200(CT) engine with existing gas turbine APU's in commercial service provides the potential for field testing of ceramic components. The 1993 ATTAP activities emphasized design modifications of the 331-200 engine test bed to accommodate ceramic first-stage turbine nozzles and blades, fabrication of the ceramic components, ceramic component proof and rig tests, operational tests of the test bed equipped with the ceramic components, and refinement of critical ceramic design technologies.

  15. Advanced Turbine Technology Applications Project (ATTAP) 1993 annual report

    NASA Astrophysics Data System (ADS)

    1994-07-01

    This report summarizes work performed by AlliedSignal Engines, a unit of AlliedSignal Aerospace Company, during calendar year 1993, toward development and demonstration of structural ceramic technology for automotive gas turbine engines. This work was performed for the U.S. Department of Energy (DOE) under National Aeronautics and Space Administration (NASA) Contract DEN3-335, Advanced Turbine Technology Applications Project (ATFAP). During 1993, the test bed used to demonstrate ceramic technology was changed from the AlliedSignal Engines/Garrett Model AGT101 regenerated gas turbine engine to the Model 331-200(CT) engine. The 331-200(CT) ceramic demonstrator is a fully-developed test platform based on the existing production AlliedSignal 331-200(ER) gas turbine auxiliary power unit (APU), and is well suited to evaluating ceramic turbine blades and nozzles. In addition, commonality of the 331-200(CT) engine with existing gas turbine APU's in commercial service provides the potential for field testing of ceramic components. The 1993 ATTAP activities emphasized design modifications of the 331-200 engine test bed to accommodate ceramic first-stage turbine nozzles and blades, fabrication of the ceramic components, ceramic component proof and rig tests, operational tests of the test bed equipped with the ceramic components, and refinement of critical ceramic design technologies.

  16. Advances in functional magnetic resonance imaging: technology and clinical applications.

    PubMed

    Dickerson, Bradford C

    2007-07-01

    Functional MRI (fMRI) is a valuable method for use by clinical investigators to study task-related brain activation in patients with neurological or neuropsychiatric illness. Despite the relative infancy of the field, the rapid adoption of this functional neuroimaging technology has resulted from, among other factors, its ready availability, its relatively high spatial and temporal resolution, and its safety as a noninvasive imaging tool that enables multiple repeated scans over the course of a longitudinal study, and thus may lend itself well as a measure in clinical drug trials. Investigators have used fMRI to identify abnormal functional brain activity during task performance in a variety of patient populations, including those with neurodegenerative, demyelinating, cerebrovascular, and other neurological disorders that highlight the potential utility of fMRI in both basic and clinical spheres of research. In addition, fMRI studies reveal processes related to neuroplasticity, including compensatory hyperactivation, which may be a universally-occurring, adaptive neural response to insult. Functional MRI is being used to study the modulatory effects of genetic risk factors for neurological disease on brain activation; it is being applied to differential diagnosis, as a predictive biomarker of disease course, and as a means to identify neural correlates of neurotherapeutic interventions. Technological advances are rapidly occurring that should provide new applications for fMRI, including improved spatial resolution, which promises to reveal novel insights into the function of fine-scale neural circuitry of the human brain in health and disease.

  17. Applications of advanced upper surface blowing propulsive-lift technology

    NASA Technical Reports Server (NTRS)

    Cochrane, J. A.; Riddle, D. W.; Youth, S.

    1982-01-01

    The success of the Quiet Short-Haul Research Aircraft led to studies of this technology for a business jet and a Short-Haul Transport. The studies showed that the Short-Haul Transport could operate from a 762.0-m runway with 95 passengers at low noise levels. Design range was 500 n. mi. but with maximum fuel load the runway length is only increased to 883.9 m while the range is increased to more than 1000 n. mi. Two business jet designs were studied; one design was based on a 457.2-m field length and the other was designed for a 760.0-m field length. The business jet designed for a 457.2-m field length can also be loaded to maximum fuel capacity. In this case the range increases from 500 n. mi. to 1400 n. mi. while the runway length increases from 457.2 m to 632.5 m. The business jet studies showed that the application of advanced propulsive-lift technology to this class aircraft can result in payload-range-speed performance comparable to current aircraft with about one-half the runway length requirement.

  18. Polymers as advanced materials for desiccant applications, 1988

    SciTech Connect

    Czanderna, A.W.; Neidlinger, H.H.

    1990-09-01

    This report documents work to identify a next-generation, low-cost material with which solar energy or heat from another low-cost energy source can be used for regenerating the water vapor sorption activity of the desiccant. The objective of the work is to determine how the desired sorption performance of advanced desiccant materials can be predicted by understanding the role of the material modifications and material surfaces. The work concentrates on solid materials to be used for desiccant cooling systems and which process water vapor in an atmosphere to produce cooling. The work involved preparing modifications of polystyrene sulfonic acid sodium salt, synthesizing a hydrogel, and evaluating the sorption performances of these and similar commercially available polymeric materials; all materials were studied for their potential application in solid commercial desiccant cooling systems. Background information is also provided on desiccant cooling systems and the role of a desiccant material within such a system, and it includes the use of polymers as desiccant materials. 31 refs., 16 figs., 5 tabs.

  19. Advances in the application of diffusion Monte Carlo to solids

    NASA Astrophysics Data System (ADS)

    Shulenburger, L.; Mattsson, T. R.

    2014-03-01

    The need for high fidelity electronic structure calculations has catalyzed an explosion in the development of new techniques. Improvements in DFT functionals, many body perturbation theory and dynamical mean field theory are starting to make significant headway towards reaching the accuracy required for a true predictive capability. One technique that is undergoing a resurgence is diffusion Monte Carlo (DMC). The early calculations with this method were of unquestionable accuracy (providing a valuable reference for DFT functionals) but were largely limited to model systems because of their high computational cost. Algorithmic advances and improvements in computer power have reached the point where this is no longer an insurmountable obstacle. In this talk I will present a broad study of DMC applied to condensed matter (arXiv:1310.1047). We have shown excellent agreement for the bulk modulus and lattice constant of solids exhibiting several different types of binding, including ionic, covalent and van der Waals. We will discuss both the opportunities for application of this method as well as opportunities for further theoretical improvements. Sandia National Laboratories is a multiprogram laboratory managed and operated by Sandia Corporation, a wholly owned subsidiary of Lockheed Martin Corporation, for the U.S. Department of Energy's NNSA under Contract No. DE-AC04-94AL85000.

  20. Ground-to-orbit laser propulsion: Advanced applications

    SciTech Connect

    Kare, J.T.

    1990-01-01

    Laser propulsion uses a large fixed laser to supply energy to heat an inert propellant in a rocket thruster. Such a system has two potential advantages: extreme simplicity of the thruster, and potentially high performance -- particularly high exhaust velocity. By taking advantage of the simplicity of the thruster, it should be possible to launch small (10--1000 kg) payloads to orbit using roughly 1 MW of average laser power per kg of payload. The incremental cost of such launches would be of order $200/kg for the smallest systems, decreasing to essentially the cost of electricity to run the laser (a few times $10/kg) for large systems. Although the individual payload size would be small, a laser launch system would be inherently high-volume, with the capacity to launch tens of thousands of payloads per year. Also, with high exhaust velocity, a laser launch system could launch payloads to high velocities -- geosynchronous transfer, Earth escape, or beyond -- at a relatively small premium over launches to LEO. In this paper, we briefly review the status of pulsed laser propulsion, including proposals for advanced vehicles. We then discuss qualitatively several unique applications appropriate to the early part of the next century, and perhaps valuable well into the next millenium: space habitat supply, deep space mission supply, nuclear waste disposal, and manned vehicle launching.

  1. Capillary force lithography for cardiac tissue engineering.

    PubMed

    Macadangdang, Jesse; Lee, Hyun Jung; Carson, Daniel; Jiao, Alex; Fugate, James; Pabon, Lil; Regnier, Michael; Murry, Charles; Kim, Deok-Ho

    2014-06-10

    Cardiovascular disease remains the leading cause of death worldwide(1). Cardiac tissue engineering holds much promise to deliver groundbreaking medical discoveries with the aims of developing functional tissues for cardiac regeneration as well as in vitro screening assays. However, the ability to create high-fidelity models of heart tissue has proven difficult. The heart's extracellular matrix (ECM) is a complex structure consisting of both biochemical and biomechanical signals ranging from the micro- to the nanometer scale(2). Local mechanical loading conditions and cell-ECM interactions have recently been recognized as vital components in cardiac tissue engineering(3-5). A large portion of the cardiac ECM is composed of aligned collagen fibers with nano-scale diameters that significantly influences tissue architecture and electromechanical coupling(2). Unfortunately, few methods have been able to mimic the organization of ECM fibers down to the nanometer scale. Recent advancements in nanofabrication techniques, however, have enabled the design and fabrication of scalable scaffolds that mimic the in vivo structural and substrate stiffness cues of the ECM in the heart(6-9). Here we present the development of two reproducible, cost-effective, and scalable nanopatterning processes for the functional alignment of cardiac cells using the biocompatible polymer poly(lactide-co-glycolide) (PLGA)(8) and a polyurethane (PU) based polymer. These anisotropically nanofabricated substrata (ANFS) mimic the underlying ECM of well-organized, aligned tissues and can be used to investigate the role of nanotopography on cell morphology and function(10-14). Using a nanopatterned (NP) silicon master as a template, a polyurethane acrylate (PUA) mold is fabricated. This PUA mold is then used to pattern the PU or PLGA hydrogel via UV-assisted or solvent-mediated capillary force lithography (CFL), respectively(15,16). Briefly, PU or PLGA pre-polymer is drop dispensed onto a glass coverslip

  2. Capillary Force Lithography for Cardiac Tissue Engineering

    PubMed Central

    Macadangdang, Jesse; Lee, Hyun Jung; Carson, Daniel; Jiao, Alex; Fugate, James; Pabon, Lil; Regnier, Michael; Murry, Charles; Kim, Deok-Ho

    2014-01-01

    Cardiovascular disease remains the leading cause of death worldwide1. Cardiac tissue engineering holds much promise to deliver groundbreaking medical discoveries with the aims of developing functional tissues for cardiac regeneration as well as in vitro screening assays. However, the ability to create high-fidelity models of heart tissue has proven difficult. The heart’s extracellular matrix (ECM) is a complex structure consisting of both biochemical and biomechanical signals ranging from the micro- to the nanometer scale2. Local mechanical loading conditions and cell-ECM interactions have recently been recognized as vital components in cardiac tissue engineering3-5. A large portion of the cardiac ECM is composed of aligned collagen fibers with nano-scale diameters that significantly influences tissue architecture and electromechanical coupling2. Unfortunately, few methods have been able to mimic the organization of ECM fibers down to the nanometer scale. Recent advancements in nanofabrication techniques, however, have enabled the design and fabrication of scalable scaffolds that mimic the in vivo structural and substrate stiffness cues of the ECM in the heart6-9. Here we present the development of two reproducible, cost-effective, and scalable nanopatterning processes for the functional alignment of cardiac cells using the biocompatible polymer poly(lactide-co-glycolide) (PLGA)8 and a polyurethane (PU) based polymer. These anisotropically nanofabricated substrata (ANFS) mimic the underlying ECM of well-organized, aligned tissues and can be used to investigate the role of nanotopography on cell morphology and function10-14. Using a nanopatterned (NP) silicon master as a template, a polyurethane acrylate (PUA) mold is fabricated. This PUA mold is then used to pattern the PU or PLGA hydrogel via UV-assisted or solvent-mediated capillary force lithography (CFL), respectively15,16. Briefly, PU or PLGA pre-polymer is drop dispensed onto a glass coverslip and the PUA

  3. Advances in endodontics: Potential applications in clinical practice

    PubMed Central

    Kishen, Anil; Peters, Ove A.; Zehnder, Matthias; Diogenes, Anibal R.; Nair, Madhu K.

    2016-01-01

    Contemporary endodontics has seen an unprecedented advance in technology and materials. This article aimed to review some of the challenges and advances in the following sections: (1) endodontic imaging, (2) root canal preparation, (3) root canal disinfection, (4) root canal filling, and (4) regenerative endodontic procedures (REPs). Jointly, these advances are aimed at improving the state of the art and science of root canal treatment. PMID:27217630

  4. Advances in endodontics: Potential applications in clinical practice.

    PubMed

    Kishen, Anil; Peters, Ove A; Zehnder, Matthias; Diogenes, Anibal R; Nair, Madhu K

    2016-01-01

    Contemporary endodontics has seen an unprecedented advance in technology and materials. This article aimed to review some of the challenges and advances in the following sections: (1) endodontic imaging, (2) root canal preparation, (3) root canal disinfection, (4) root canal filling, and (4) regenerative endodontic procedures (REPs). Jointly, these advances are aimed at improving the state of the art and science of root canal treatment. PMID:27217630

  5. Nanoimprint lithography for functional polymer patterning

    NASA Astrophysics Data System (ADS)

    Cui, Dehu

    2011-07-01

    Organic semiconductors have generated huge interested in recent years for low-cost and flexible electronics. Current and future device applications for semiconducting polymers include light-emitting diodes, thin-film transistors, photovoltaic cells, photodetectors, lasers, and memories. The performance of conjugated polymer devices depends on two major factors: the chain conformation in polymer film and the device architecture. Highly ordered chain structure usually leads to much improved performance by enhancing interchain interaction to facilitate carrier transport. The goal of this research is to improve the performance of organic devices with the nanoimprint lithography. The work begins with the controlling of polymer chain orientation in patterned nanostructures through nanoimprint mold design and process parameter manipulation, and studying the effect of chain ordering on material properties. Then, step-and-repeat thermal nanoimprint technique for large-scale continuous manufacturing of conjugated polymer nanostructures is developed. After that, Systematic investigation of polymer chain configuration by Raman spectroscopy is carried out to understand how nanoimprint process parameters, such as mold pattern size, temperature, and polymer molecular weight, affects polymer chain configuration. The results indicate that chain orientation in nanoimprinted polymer micro- and nanostructures is highly related to the nanoimprint temperature and the dimensions of the mold structures. The ability to create nanoscale polymer micro- and nanostructures and manipulate their internal chain conformation establishes an original experimental platform that enables studying the properties of functional polymers at the micro- and nanoscale and understanding their fundamental structure-property relationships. In addition to the impact on basic research, the techniques developed in this work are important in applied research and development. Large-area conjugated polymer micro- and

  6. Research and development on the application of advanced control technologies to advanced nuclear reactor systems: A US national perspective

    SciTech Connect

    White, J.D.; Monson, L.R.; Carrol, D.G.; Dayal, Y.; Argonne National Lab., IL; General Electric Co., San Jose, CA )

    1989-01-01

    Control system designs for nuclear power plants are becoming more advanced through the use of digital technology and automation. This evolution is taking place because of: (1) the limitations in analog based control system performance and maintenance and availability and (2) the promise of significant improvement in plant operation and availability due to advances in digital and other control technologies. Digital retrofits of control systems in US nuclear plants are occurring now. Designs of control and protection systems for advanced LWRs are based on digital technology. The use of small inexpensive, fast, large-capacity computers in these designs is the first step of an evolutionary process described in this paper. Under the sponsorship of the US Department of Energy (DOE), Oak Ridge National Laboratory, Argonne National Laboratory, GE Nuclear Energy and several universities are performing research and development in the application of advances in control theory, software engineering, advanced computer architectures, artificial intelligence, and man-machine interface analysis to control system design. The target plant concept for the work described in this paper is the Power Reactor Inherently Safe Module reactor (PRISM), an advanced modular liquid metal reactor concept. This and other reactor designs which provide strong passive responses to operational upsets or accidents afford good opportunities to apply these advances in control technology. 18 refs., 5 figs.

  7. Microstructurally tailored ceramics for advanced energy applications by thermoreversible gelcasting

    NASA Astrophysics Data System (ADS)

    Shanti, Noah Omar

    Thermoreversible gelcasting (TRG) is an advantageous technique for rapidly producing bulk, net-shape ceramics and laminates. In this method, ceramic powder is suspended in warm acrylate triblock copolymer/alcohol solutions that reversibly gel upon cooling by the formation of endblock aggregates, to produce slurries which are cast into molds. Gel properties can be tailored by controlling the endblock and midblock lengths of the copolymer network-former and selecting an appropriate alcohol solvent. This research focuses on expanding and improving TRG techniques, focusing specifically on advanced energy applications including the solid oxide fuel cell (SOFC). Rapid drying of filled gels can lead to warping and cracking caused by high differential capillary stresses. A new drying technique using concentrated, alcohol-based solutions as liquid desiccants (LDs) to greatly reduce warping is introduced. The optimal LD is a poly(tert-butyl acrylate)/isopropyl alcohol solution with 5 mol% tert-butyl acrylate units. Alcohol emissions during drying are completely eliminated by combining initial drying in an LD with final stage drying in a vacuum oven having an in-line solvent trap. Porous ceramics are important structures for many applications, including SOFCs. Pore network geometries are tailored by the addition of fugitive fillers to TRG slurries. Uniform spherical, bimodal spherical and uniform fibrous fillers are used. Three-dimensional pore structures are visualized by X-ray computed tomography, allowing for direct measurements of physical parameters such as concentration and morphology as well as transport properties such as tortuosity. Tortuosity values as low as 1.52 are achieved when 60 vol% of solids are uniform spherical filler. Functionally graded laminates with layers ranging from 10 mum to > 1 mm thick are produced with a new technique that combines TRG with tape casting. Gels used for bulk casting are not suitable for use with tape casting, and appropriate base

  8. Candidate plasma-facing materials for EUV lithography source components

    NASA Astrophysics Data System (ADS)

    Hassanein, Ahmed; Burtseva, Tatiana; Brooks, Jeff N.; Konkashbaev, Isak K.; Rice, Bryan J.

    2003-06-01

    Material selection and lifetime issues for extreme ultraviolet (EUV) lithography are of critical importance to the success of this technology for commercial applications. This paper reviews current trends in production and use of plasma-facing electrodes, insulators, and wall materials for EUV type sources. Ideal candidate materials should be able to: withstand high thermal shock from the short pulsed plasma; withstand high thermal loads without structural failure; reduce debris generation during discharge; and be machined accurately. We reviewed the literature on current and proposed fusion plasma-facing materials as well as current experience with plasma gun and other simulation devices. Both fusion and EUV source materials involve issues of surface erosion by particle sputtering and heat-induced evaporation/melting. These materials are either bare structural materials or surface coatings. EUV materials can be divided into four categories: wall, electrode, optical, and insulator materials. For electric discharge sources, all four types are required, whereas laser-produced plasma EUV sources do not require electrode and insulator materials. Several types of candidate alloy and other materials and methods of manufacture are recommended for each component of EUV lithography light sources.

  9. Probing cell migration in confined environments by plasma lithography.

    PubMed

    Junkin, Michael; Wong, Pak Kin

    2011-03-01

    Cellular processes are regulated by various mechanical and physical factors in their local microenvironment such as geometric confinements, cell-substrate interactions, and cell-cell contact. Systematic elucidation of these regulatory mechanisms is crucial for fundamental understanding of cell biology and for rational design of biomedical devices and regenerative medicine. Here, we report a generally applicable plasma lithography technique, which performs selective surface functionalization on large substrate areas, for achieving long-term, stable confinements with length scales from 100 nm to 1 cm toward the investigation of cell-microenvironment interactions. In particular, we applied plasma lithography for cellular confinement of neuroblastomas, myoblasts, endothelial cells, and mammary gland epithelial cells, and examined the motion of mouse embryonic fibroblasts in directionality-confined environments for studying the effect of confinements on migratory behavior. In conjunction with live cell imaging, the distance traveled, velocity, and angular motion of individual cells and collective cell migration behaviors were measured in confined environments with dimensions comparable to a cell. A critical length scale that a cell could conceivably occupy and migrate to was also identified by investigating the behaviors of cells using confined environments with subcellular length scales.

  10. Direct modification of silicon surface by nanosecond laser interference lithography

    NASA Astrophysics Data System (ADS)

    Wang, Dapeng; Wang, Zuobin; Zhang, Ziang; Yue, Yong; Li, Dayou; Maple, Carsten

    2013-10-01

    Periodic and quasi-periodic structures on silicon surface have numerous significant applications in photoelectronics and surface engineering. A number of technologies have been developed to fabricate the structures in various research fields. In this work, we take the strategy of direct nanosecond laser interference lithography technology, and focus on the silicon material to create different well-defined surface structures based on theoretical analysis of the formation of laser interference patterns. Two, three and four-beam laser interference systems were set up to fabricate the grating, regular triangle and square structures on silicon surfaces, respectively. From the AFM micrographs, the critical features of structures have a dependence on laser fluences. For a relative low laser fluence, grating and dot structures formed with bumps due to the Marangoni Effect. With the increase of laser fluences, melt and evaporation behaviors can be responsible for the laser modification. By properly selecting the process parameters, well-defined grating and dot structures can been achieved. It can be demonstrated that direct laser interference lithography is a facile and efficient technology with the advantage of a single process procedure over macroscale areas for the fabrication of micro and nano structures.

  11. 1x stencil masks fabrication and their use in Low-Energy Electron-beam Proximity Lithography (LEEPL)

    NASA Astrophysics Data System (ADS)

    Behringer, Uwe F. W.

    2004-12-01

    Thirty years ago it was the common believe of most of the lithographer that the limit end for the optical lithography will be at about 1 μm ground rule. So NGL tools were developed to go in the 500nm and 250nm regions. 15 years later the different optical lithography techniques were still alive exposing feature sizes down to 200nm and the NGL tool developer had to move to 100nm and below. Today 100nm features made by optical lithography is world wide a common technique in most of the modern chip manufacturing plants, and feature sizes beyond the used wavelength are state of art. So do we really need NGL or will the optical lithography lives forever? Well, there are already optical system available or will be soon delivered to the manufacturing lines which are able to expose feature sizes down to 70nm and even to 50nm if they use 193nm immersion lithography. But for what price? The optical lithography became extremely expensive. Reticles for the 70nm technology full with OPC structures may cost up to 500 K and an optical reticle set up to 2 Million. So in my understanding the introduction of any NGL technique will only happen if such a technique can demonstrate at least the same performance as the optical lithography but at a lower cost level. The best understood NGLs are the electron beam lithography techniques used in e-beam direct writing tools for the exposure of masks and reticles or e-beam techniques which expose the wafers using masks like E-beam Projection Lithography (EPL) or Low Energy E-beam Proximity Lithography (LEEPL) respectively. Both EPL and LEEPL require a similar mask technique so called stencil masks. The first 1x stencil masks (a silicon wafer with a thin membrane area containing the pattern as physical holes) were developed by IBM Germany more than 25 years ago and perfected in the Advanced Mask Facility (AMF) at IBM Vermont. Today, these 1x stencil masks used for LEEPL are mainly produced by Hoya, DNP, Toppan and NTT-AT in Japan. This paper

  12. CMOS compatible fabrication of 3D photonic crystals by nanoimprint lithography

    NASA Astrophysics Data System (ADS)

    Eibelhuber, M.; Uhrmann, T.; Glinsner, T.

    2015-03-01

    Nanoimprinting techniques are an attractive solution for next generation lithography methods for several areas including photonic devices. A variety of potential applications have been demonstrated using nanoimprint lithography (NIL) (e.g. SAW devices, vias and contact layers with dual damascene imprinting process, Bragg structures, patterned media) [1,2]. Nanoimprint lithography is considered for bridging the gap from R and D to high volume manufacturing. In addition, it is capable to adapt to the needs of the fragmented and less standardized photonic market easily. In this work UV-NIL has been selected for the fabrication process of 3D-photonic crystals. It has been shown that UVNIL using a multiple layer approach is well suited to fabricate a 3D woodpile photonic crystal. The necessary alignment accuracies below 100nm were achieved using a simple optical method. In order to obtain sufficient alignment of the stacks to each other, a two stage alignment process is performed: at first proximity alignment is done followed by the Moiré alignment in soft contact with the substrate. Multiple steps of imprinting, etching, Si deposition and chemical mechanical polishing were implemented to create high quality 3D photonic crystals with up to 5 layers. This work has proven the applicability of nanoimprint lithography in a CMOS compatible process on 3D photonic crystals with alignment accuracy down to 100nm. Optimizing the processes will allow scaling up these structures on full wafers while still meeting the requirements of the designated devices.

  13. Polymer-based optical interconnects using nanoimprint lithography

    NASA Astrophysics Data System (ADS)

    Boersma, Arjen; Wiegersma, Sjoukje; Offrein, Bert J.; Duis, Jeroen; Delis, Jos; Ortsiefer, Markus; van Steenberge, Geert; Karpinen, Mikko; van Blaaderen, Alfons; Corbett, Brian

    2013-02-01

    The increasing request for higher data speeds in the information and communication technology leads to continuously increasing performance of microprocessors. This has led to the introduction of optical data transmission as a replacement of electronic data transmission in most transmission applications longer than 10 meters. However, a need remains for optical data transmission for shorter distances inside the computer. This paper gives an overview of the Joint European project FIREFLY, in which new polymer based single mode waveguides are developed for integration with VCSELs, splitters and fibers that will be manufactured using multi-layer nanoimprint lithography (NIL). Innovative polymers, new applications of nano-technology, new methods for optical coupling between components, and the integration of all these new components are the technical ingredients of this ambitious project.

  14. MIRRORCLE-type tabletop/portable SR sources for advanced applications

    NASA Astrophysics Data System (ADS)

    Yamada, Hironari

    2007-03-01

    MIRRORCLE is a tabletop/portable synchrotron light source. It generates 10 mW order far infrared, watt order EUV/soft X-ray, and brilliant hard X-rays in 10 to 1000 keV range. MIRRORCLE is also a synchrotron that can generate directly monochromatic X-ray beam. MIRRORCLE is a medical diagnostics system similar to a X-ray tube radiology, but is very different in its fine spatial resolution and coherence of X-ray. A difference in the material density instead of in the atomic number is distinguished by the phase contrast method, due to its highly coherent beam. MIRRORCLE is a non-destructive testing system for more than 10cm thick heavy constructions with 10-μm order fine spatial resolution. MIRRORCLE is an EUV lithography source, a laboratory size protein crystallography system, as well as a X-ray microscope. We discuss advanced features of this multi-functional light source MIRRORCLE.

  15. Aqueous multiphoton lithography with multifunctional silk-centred bio-resists

    NASA Astrophysics Data System (ADS)

    Sun, Yun-Lu; Li, Qi; Sun, Si-Ming; Huang, Jing-Chun; Zheng, Bo-Yuan; Chen, Qi-Dai; Shao, Zheng-Zhong; Sun, Hong-Bo

    2015-10-01

    Silk and silk fibroin, the biomaterial from nature, nowadays are being widely utilized in many cutting-edge micro/nanodevices/systems via advanced micro/nanofabrication techniques. Herein, for the first time to our knowledge, we report aqueous multiphoton lithography of diversiform-regenerated-silk-fibroin-centric inks using noncontact and maskless femtosecond laser direct writing (FsLDW). Initially, silk fibroin was FsLDW-crosslinked into arbitrary two/three-dimensional micro/nanostructures with good elastic properties merely using proper photosensitizers. More interestingly, silk/metal composite micro/nanodevices with multidimension-controllable metal content can be FsLDW-customized through laser-induced simultaneous fibroin oxidation/crosslinking and metal photoreduction using the simplest silk/Ag+ or silk/[AuCl4]- aqueous resists. Noticeably, during FsLDW, fibroin functions as biological reductant and matrix, while metal ions act as the oxidant. A FsLDW-fabricated prototyping silk/Ag microelectrode exhibited 104-Ω-1 m-1-scale adjustable electric conductivity. This work not only provides a powerful development to silk micro/nanoprocessing techniques but also creates a novel way to fabricate multifunctional metal/biomacromolecule complex micro/nanodevices for applications such as micro/nanoscale mechanical and electrical bioengineering and biosystems.

  16. Aqueous multiphoton lithography with multifunctional silk-centred bio-resists

    PubMed Central

    Sun, Yun-Lu; Li, Qi; Sun, Si-Ming; Huang, Jing-Chun; Zheng, Bo-Yuan; Chen, Qi-Dai; Shao, Zheng-Zhong; Sun, Hong-Bo

    2015-01-01

    Silk and silk fibroin, the biomaterial from nature, nowadays are being widely utilized in many cutting-edge micro/nanodevices/systems via advanced micro/nanofabrication techniques. Herein, for the first time to our knowledge, we report aqueous multiphoton lithography of diversiform-regenerated-silk-fibroin-centric inks using noncontact and maskless femtosecond laser direct writing (FsLDW). Initially, silk fibroin was FsLDW-crosslinked into arbitrary two/three-dimensional micro/nanostructures with good elastic properties merely using proper photosensitizers. More interestingly, silk/metal composite micro/nanodevices with multidimension-controllable metal content can be FsLDW-customized through laser-induced simultaneous fibroin oxidation/crosslinking and metal photoreduction using the simplest silk/Ag+ or silk/[AuCl4]− aqueous resists. Noticeably, during FsLDW, fibroin functions as biological reductant and matrix, while metal ions act as the oxidant. A FsLDW-fabricated prototyping silk/Ag microelectrode exhibited 104-Ω−1 m−1-scale adjustable electric conductivity. This work not only provides a powerful development to silk micro/nanoprocessing techniques but also creates a novel way to fabricate multifunctional metal/biomacromolecule complex micro/nanodevices for applications such as micro/nanoscale mechanical and electrical bioengineering and biosystems. PMID:26472600

  17. Aqueous multiphoton lithography with multifunctional silk-centred bio-resists.

    PubMed

    Sun, Yun-Lu; Li, Qi; Sun, Si-Ming; Huang, Jing-Chun; Zheng, Bo-Yuan; Chen, Qi-Dai; Shao, Zheng-Zhong; Sun, Hong-Bo

    2015-01-01

    Silk and silk fibroin, the biomaterial from nature, nowadays are being widely utilized in many cutting-edge micro/nanodevices/systems via advanced micro/nanofabrication techniques. Herein, for the first time to our knowledge, we report aqueous multiphoton lithography of diversiform-regenerated-silk-fibroin-centric inks using noncontact and maskless femtosecond laser direct writing (FsLDW). Initially, silk fibroin was FsLDW-crosslinked into arbitrary two/three-dimensional micro/nanostructures with good elastic properties merely using proper photosensitizers. More interestingly, silk/metal composite micro/nanodevices with multidimension-controllable metal content can be FsLDW-customized through laser-induced simultaneous fibroin oxidation/crosslinking and metal photoreduction using the simplest silk/Ag(+) or silk/[AuCl4](-) aqueous resists. Noticeably, during FsLDW, fibroin functions as biological reductant and matrix, while metal ions act as the oxidant. A FsLDW-fabricated prototyping silk/Ag microelectrode exhibited 10(4)-Ω(-1 ) m(-1)-scale adjustable electric conductivity. This work not only provides a powerful development to silk micro/nanoprocessing techniques but also creates a novel way to fabricate multifunctional metal/biomacromolecule complex micro/nanodevices for applications such as micro/nanoscale mechanical and electrical bioengineering and biosystems.

  18. Aqueous multiphoton lithography with multifunctional silk-centred bio-resists.

    PubMed

    Sun, Yun-Lu; Li, Qi; Sun, Si-Ming; Huang, Jing-Chun; Zheng, Bo-Yuan; Chen, Qi-Dai; Shao, Zheng-Zhong; Sun, Hong-Bo

    2015-01-01

    Silk and silk fibroin, the biomaterial from nature, nowadays are being widely utilized in many cutting-edge micro/nanodevices/systems via advanced micro/nanofabrication techniques. Herein, for the first time to our knowledge, we report aqueous multiphoton lithography of diversiform-regenerated-silk-fibroin-centric inks using noncontact and maskless femtosecond laser direct writing (FsLDW). Initially, silk fibroin was FsLDW-crosslinked into arbitrary two/three-dimensional micro/nanostructures with good elastic properties merely using proper photosensitizers. More interestingly, silk/metal composite micro/nanodevices with multidimension-controllable metal content can be FsLDW-customized through laser-induced simultaneous fibroin oxidation/crosslinking and metal photoreduction using the simplest silk/Ag(+) or silk/[AuCl4](-) aqueous resists. Noticeably, during FsLDW, fibroin functions as biological reductant and matrix, while metal ions act as the oxidant. A FsLDW-fabricated prototyping silk/Ag microelectrode exhibited 10(4)-Ω(-1 ) m(-1)-scale adjustable electric conductivity. This work not only provides a powerful development to silk micro/nanoprocessing techniques but also creates a novel way to fabricate multifunctional metal/biomacromolecule complex micro/nanodevices for applications such as micro/nanoscale mechanical and electrical bioengineering and biosystems. PMID:26472600

  19. Advanced nanomaterials–sustainable preparation and their catalytic applications

    EPA Science Inventory

    Sustainable nanomaterials have attracted great attention as highly functionalized nanocatalysts in diverse forms including solid-supported nanocatalysts, graphene materials, and core-shell catalysts among other nanostructures. Technology advancements in last decades have allowed ...

  20. Tunable lithography masks using chiral nematic fluids

    NASA Astrophysics Data System (ADS)

    Jeong, Hyeon Su; Srinivasarao, Mohan; Jung, Hee-Tae

    2013-03-01

    We present a facile route for pattern formation using chiral nematic fluids as tunable masks in lithography process. The chiral nematic phase prepared by adding a chiral dopant (CB15) to 5CB acted as a set of parallel cylindrical lenses and as a polarization selective photomask for the preparation of periodic line patterns. The pitch of the helical twist was easily controlled by the concentration of chiral agent and the feature size of the resulting pattern was easily tuned. Because of the high mobility of the small liquid crystalline compound, the preparation of chiral nematic fluids based lithography masks requires only a few seconds. This approach has significant advantages including facility, range of surface ordering, and rate of forming periodic arrays. Current affiliation: SK Innovation, Daejeon, Korea

  1. Application of advanced technologies to small, short-haul aircraft

    NASA Technical Reports Server (NTRS)

    Andrews, D. G.; Brubaker, P. W.; Bryant, S. L.; Clay, C. W.; Giridharadas, B.; Hamamoto, M.; Kelly, T. J.; Proctor, D. K.; Myron, C. E.; Sullivan, R. L.

    1978-01-01

    The results of a preliminary design study which investigates the use of selected advanced technologies to achieve low cost design for small (50-passenger), short haul (50 to 1000 mile) transports are reported. The largest single item in the cost of manufacturing an airplane of this type is labor. A careful examination of advanced technology to airframe structure was performed since one of the most labor-intensive parts of the airplane is structures. Also, preliminary investigation of advanced aerodynamics flight controls, ride control and gust load alleviation systems, aircraft systems and turbo-prop propulsion systems was performed. The most beneficial advanced technology examined was bonded aluminum primary structure. The use of this structure in large wing panels and body sections resulted in a greatly reduced number of parts and fasteners and therefore, labor hours. The resultant cost of assembled airplane structure was reduced by 40% and the total airplane manufacturing cost by 16% - a major cost reduction. With further development, test verification and optimization appreciable weight saving is also achievable. Other advanced technology items which showed significant gains are as follows: (1) advanced turboprop-reduced block fuel by 15.30% depending on range; (2) configuration revisions (vee-tail)-empennage cost reduction of 25%; (3) leading-edge flap addition-weight reduction of 2500 pounds.

  2. Implementation of assist features in EUV lithography

    NASA Astrophysics Data System (ADS)

    Jiang, Fan; Burkhardt, Martin; Raghunathan, Ananthan; Torres, Andres; Gupta, Rachit; Word, James

    2015-03-01

    The introduction of EUV lithography will happen at a critical feature pitch which corresponds to a k1 factor of roughly 0.45. While this number seems not very aggressive compared to recent ArF lithography nodes, the number is sufficiently low that the introduction of assist features has to be considered. While the small NA makes the k1 factor larger, the depth of focus still needs to be scaled down with wavelength. However the exposure tool's focus control is not greatly improved over the ArF tools, so other solutions to improve the depth of focus, e.g. SRAFs, are needed. On the other hand, sub-resolution assist features (SRAFs) require very small mask dimensions, which make masks more costly to write and inspect. Another disadvantage of SRAFs is the fact that they may cause pattern-dependent best focus shift due to thick mask effects. Those effects can be predicted, but the shift of best focus and the associated tilt of Bossung curves make the process more difficult to control. We investigate the impact of SRAFs on printing in EUV lithography and evaluate advantages and disadvantages. By using image quality parameters such as best focus (BF), and depth of focus (DOF), respectively with and without SRAFs, we will answer the question if we can gain a net benefit for 1D and 2D patterns by adding SRAFs. SRAFs will only be introduced if any net improvement in process variation (PV) outweighs the additional expense of assist patterning on the mask. In this paper, we investigate the difference in printing behavior of symmetric and asymmetric SRAF placement and whether through slit effect needs to be considered in SRAF placement for EUV lithography.

  3. Development and Applications of Advanced Electronic Structure Methods

    NASA Astrophysics Data System (ADS)

    Bell, Franziska

    This dissertation contributes to three different areas in electronic structure theory. The first part of this thesis advances the fundamentals of orbital active spaces. Orbital active spaces are not only essential in multi-reference approaches, but have also become of interest in single-reference methods as they allow otherwise intractably large systems to be studied. However, despite their great importance, the optimal choice and, more importantly, their physical significance are still not fully understood. In order to address this problem, we studied the higher-order singular value decomposition (HOSVD) in the context of electronic structure methods. We were able to gain a physical understanding of the resulting orbitals and proved a connection to unrelaxed natural orbitals in the case of Moller-Plesset perturbation theory to second order (MP2). In the quest to find the optimal choice of the active space, we proposed a HOSVD for energy-weighted integrals, which yielded the fastest convergence in MP2 correlation energy for small- to medium-sized active spaces to date, and is also potentially transferable to coupled-cluster theory. In the second part, we studied monomeric and dimeric glycerol radical cations and their photo-induced dissociation in collaboration with Prof. Leone and his group. Understanding the mechanistic details involved in these processes are essential for further studies on the combustion of glycerol and carbohydrates. To our surprise, we found that in most cases, the experimentally observed appearance energies arise from the separation of product fragments from one another rather than rearrangement to products. The final chapters of this work focus on the development, assessment, and application of the spin-flip method, which is a single-reference approach, but capable of describing multi-reference problems. Systems exhibiting multi-reference character, which arises from the (near-) degeneracy of orbital energies, are amongst the most

  4. Metallic resist for phase-change lithography

    PubMed Central

    Zeng, Bi Jian; Huang, Jun Zhu; Ni, Ri Wen; Yu, Nian Nian; Wei, Wei; Hu, Yang Zhi; Li, Zhen; Miao, Xiang Shui

    2014-01-01

    Currently, the most widely used photoresists in optical lithography are organic-based resists. The major limitations of such resists include the photon accumulation severely affects the quality of photolithography patterns and the size of the pattern is constrained by the diffraction limit. Phase-change lithography, which uses semiconductor-based resists such as chalcogenide Ge2Sb2Te5 films, was developed to overcome these limitations. Here, instead of chalcogenide, we propose a metallic resist composed of Mg58Cu29Y13 alloy films, which exhibits a considerable difference in etching rate between amorphous and crystalline states. Furthermore, the heat distribution in Mg58Cu29Y13 thin film is better and can be more easily controlled than that in Ge2Sb2Te5 during exposure. We succeeded in fabricating both continuous and discrete patterns on Mg58Cu29Y13 thin films via laser irradiation and wet etching. Our results demonstrate that a metallic resist of Mg58Cu29Y13 is suitable for phase change lithography, and this type of resist has potential due to its outstanding characteristics. PMID:24931505

  5. Immersion and 32nm lithography: now and future

    NASA Astrophysics Data System (ADS)

    Kameyama, Masaomi; McCallum, Martin

    2007-12-01

    The amazing growth of the semiconductor industry over the past decades has been supported, and in many cases driven, by miniaturization of devices. Behind this has been one strong backbone - lithography. In the 1970's, devices had geometries of several micrometers, but now we are about to enter 45nm device pre-production and shortly after move it into volume-production. Immersion lithography, although having a short development time, is already in production and will become the primary technology driver. What we need to do now is identify the solutions for 32nm lithography. There are several candidates for 32nm lithography, such as EUVL, High Index Immersion and Double Patterning / Double Exposure. Other more esoteric technologies such as nanoimprint and maskless lithography have also been mentioned. In this paper, the present status of Immersion lithography will be reviewed and each of the 32nm candidates are reviewed.

  6. A compact X-ray lithography lattice using superferric magnets

    NASA Astrophysics Data System (ADS)

    Swenson, C. A.; Huson, F. R.; Mackay, W. W.; Chen, L. K.; Ohnuma, S.

    A conceptual lattice design for a very compact superconducting synchrotron dedicated to X-ray lithography is presented. The synchrotron radiation produced in the high field superconducting magnets has a critical wavelength of 10 angstrom at a beam energy of about 787 MeV. The size and angular divergence of the beam in this lattice can satisfy future requirements for X-ray lithography. An optimization of the lithography parameters is presented.

  7. Advances in Thin Film Sensor Technologies for Engine Applications

    NASA Technical Reports Server (NTRS)

    Lei, Jih-Fen; Martin, Lisa C.; Will, Herbert A.

    1997-01-01

    Advanced thin film sensor techniques that can provide accurate surface strain and temperature measurements are being developed at NASA Lewis Research Center. These sensors are needed to provide minimally intrusive characterization of advanced materials (such as ceramics and composites) and structures (such as components for Space Shuttle Main Engine, High Speed Civil Transport, Advanced Subsonic Transports and General Aviation Aircraft) in hostile, high-temperature environments and for validation of design codes. This paper presents two advanced thin film sensor technologies: strain gauges and thermocouples. These sensors are sputter deposited directly onto the test articles and are only a few micrometers thick; the surface of the test article is not structurally altered and there is minimal disturbance of the gas flow over the surface. The strain gauges are palladium-13% chromium based and the thermocouples are platinum-13% rhodium vs. platinum. The fabrication techniques of these thin film sensors in a class 1000 cleanroom at the NASA Lewis Research Center are described. Their demonstration on a variety of engine materials, including superalloys, ceramics and advanced ceramic matrix composites, in several hostile, high-temperature test environments are discussed.

  8. Fabrication of anisotropically arrayed nano-slots metasurfaces using reflective plasmonic lithography.

    PubMed

    Luo, Jun; Zeng, Bo; Wang, Changtao; Gao, Ping; Liu, Kaipeng; Pu, Mingbo; Jin, Jinjin; Zhao, Zeyu; Li, Xiong; Yu, Honglin; Luo, Xiangang

    2015-11-28

    Nanofabrication technology with high-resolution, high-throughput and low-cost is essential for the development of nanoplasmonic and nanophotonic devices. At present, most metasurfaces are fabricated in a point by point writing manner with electron beam lithography or a focused ion beam, which imposes a serious cost barrier with respect to practical applications. Near field optical lithography, seemingly providing a high-resolution and low-cost way, however, suffers from the ultra shallow depth and poor fidelity of obtained photoresist patterns due to the exponential decay feature of evanescent waves. Here, we propose a method of surface plasmonic imaging lithography by introducing a reflective plasmonic lens to amplify and compensate evanescent waves, resulting in the production of nano resist patterns with high fidelity, contrast and enhanced depth beyond that usually obtained by near field optical lithography. As examples, a discrete and anisotropically arrayed nano-slots mask pattern with different orientations and a size of 40 nm × 120 nm could be imaged in photoresist and transferred successfully onto a metal layer through an etching process. Evidence for the pattern quality is given by virtue of the fabricated metasurface lens devices showing good focusing performance in experiments. It is believed that this method provides a parallel, low-cost, high-throughput and large-area nanofabrication route for fabricating nanostructures of holograms, vortex phase plates, bio-sensors and solar cells etc. PMID:26507847

  9. 76 FR 74067 - Medicare Program; Announcement of a New Application Deadline for the Advance Payment Model

    Federal Register 2010, 2011, 2012, 2013, 2014

    2011-11-30

    ... Payment Model: Applications for the performance period beginning on April ] 1, 2012 will be accepted from... announces a new deadline for applications to the Advance Payment Model for the performance period beginning... February 1, 2012. The period during which applications will be accepted for the performance...

  10. Development of Advanced Seals for Industrial Turbine Applications

    NASA Astrophysics Data System (ADS)

    Chupp, Raymond E.; Aksit, Mahmut F.; Ghasripoor, Farshad; Turnquist, Norman A.; Dinc, Saim; Mortzheim, Jason; Demiroglu, Mehmet

    2002-10-01

    A critical area being addressed to improve industrial turbine performance is reducing the parasitic leakage flows through the various static and dynamic seals. Implementation of advanced seals into General Electric (GE) industrial turbines has progressed well over the last few years with significant operating performance gains achieved. Advanced static seals have been placed in gas turbine hot gas-path junctions and steam turbine packing ring segment end gaps. Brush seals have significantly decreased labyrinth seal leakages in gas turbine compressors and turbine interstages, steam turbine interstage and end packings, industrial compressor shaft seals, and generator seals. Abradable seals are being developed for blade-tip locations in various turbine locations. This presentation summarizes the status of advanced seal development for industrial turbines at GE.

  11. Parachute systems technology: Fundamentals, concepts, and applications: Advanced parachute design

    SciTech Connect

    Peterson, C.W.; Johnson, D.W.

    1987-01-01

    Advances in high-performance parachute systems and the technologies needed to design them are presented in this paper. New parachute design and performance prediction codes are being developed to assist the designer in meeting parachute system performance requirements after a minimum number of flight tests. The status of advanced design codes under development at Sandia National Laboratories is summarized. An integral part of parachute performance prediction is the rational use of existing test data. The development of a data base for parachute design has been initiated to illustrate the effects of inflated diameter, geometric porosity, reefing line length, suspension line length, number of gores, and number of ribbons on parachute drag. Examples of advancements in parachute materials are presented, and recent problems with Mil-Spec broadgoods are reviewed. Finally, recent parachute systems tested at Sandia are summarized to illustrate new uses of old parachutes, new parachute configurations, and underwater recovery of payloads.

  12. Expected innovations of optical lithography in the next 10 years

    NASA Astrophysics Data System (ADS)

    Owa, Soichi; Hirayanagi, Noriyuki

    2016-03-01

    In the past 10 years, immersion lithography has been the most effective high volume manufacturing method for the critical layers of semiconductor devices. Thinking of the next 10 years, we can expect continuous improvement on existing 300 mm wafer scanners with better accuracy and throughput to enhance the total output value per input cost. This value productivity, however, can be upgraded also by larger innovations which might happen in optical lithography. In this paper, we will discuss the possibilities and the impossibilities of potential innovation ideas of optical lithography, which are 450 mm wafer, optical maskless, multicolor lithography, and metamaterial.

  13. Advanced photovoltaic power system technology for lunar base applications

    NASA Technical Reports Server (NTRS)

    Brinker, David J.; Flood, Dennis J.

    1988-01-01

    Advanced photovoltaic/electrochemical (batteries or regenerative fuel cells for storage) power system options for a lunar base are discussed and compared. Estimated system masses are compared with those projected for the SP-100 nuclear system. The results of the comparison are quantified in terms of the mass saved in a scenario which assembles the initial base elements in Low Earth Orbit (LEO) and launches from there to the lunar surface. A brief summary is given of advances in photovoltaic/electrochemical power system technologies currently under development in the NASA/OAST program. A description of the planned focussed technology program for surface power in the new Pathfinder initiative is also provided.

  14. Extreme-UV lithography system

    DOEpatents

    Replogle, William C.; Sweatt, William C.

    2001-01-01

    A photolithography system that employs a condenser that includes a series of aspheric mirrors on one side of a small, incoherent source of radiation producing a series of beams is provided. Each aspheric mirror images the quasi point source into a curved line segment. A relatively small arc of the ring image is needed by the camera; all of the beams are so manipulated that they all fall onto this same arc needed by the camera. Also, all of the beams are aimed through the camera's virtual entrance pupil. The condenser includes a correcting mirror for reshaping a beam segment which improves the overall system efficiency. The condenser efficiently fills the larger radius ringfield created by today's advanced camera designs. The system further includes (i) means for adjusting the intensity profile at the camera's entrance pupil or (ii) means for partially shielding the illumination imaging onto the mask or wafer. The adjusting means can, for example, change at least one of: (i) partial coherence of the photolithography system, (ii) mask image illumination uniformity on the wafer or (iii) centroid position of the illumination flux in the entrance pupil. A particularly preferred adjusting means includes at least one vignetting mask that covers at least a portion of the at least two substantially equal radial segments of the parent aspheric mirror.

  15. Assessment of the application of advanced technologies to subsonic CTOL transport aircraft

    NASA Technical Reports Server (NTRS)

    Graef, J. D.; Sallee, G. P.; Verges, J. T.

    1974-01-01

    Design studies of the application of advanced technologies to future transport aircraft were conducted. These studies were reviewed from the perspective of an air carrier. A fundamental study of the elements of airplane operating cost was performed, and the advanced technologies were ranked in order of potential profit impact. Recommendations for future study areas are given.

  16. 78 FR 71601 - KC Small Hydro LLC; Advanced Hydropower, Inc.; Notice of Preliminary Permit Application Accepted...

    Federal Register 2010, 2011, 2012, 2013, 2014

    2013-11-29

    ... Energy Regulatory Commission KC Small Hydro LLC; Advanced Hydropower, Inc.; Notice of Preliminary Permit... the applicant to KC Small Hydro LLC. (KCS Hydro). On November 5, 2013, Advanced Hydropower, Inc... the feasibility of a hydropower project to be located at the U.S. Army Corps of Engineers'...

  17. Methods and Applications for Advancing Distance Education Technologies: International Issues and Solutions

    ERIC Educational Resources Information Center

    Syed, Mahbubur Rahman, Ed.

    2009-01-01

    The emerging field of advanced distance education delivers academic courses across time and distance, allowing educators and students to participate in a convenient learning method. "Methods and Applications for Advancing Distance Education Technologies: International Issues and Solutions" demonstrates communication technologies, intelligent…

  18. 77 FR 8848 - Application for New Awards; Advanced Placement (AP) Test Fee Program

    Federal Register 2010, 2011, 2012, 2013, 2014

    2012-02-15

    ... Application for New Awards; Advanced Placement (AP) Test Fee Program AGENCY: Office of Elementary and Secondary Education, Department of Education. ACTION: Notice. Overview Information: Advanced Placement Test.... Full Text of Announcement I. Funding Opportunity Description Purpose of Program: The AP Test...

  19. 78 FR 19691 - Applications for New Awards; Advanced Placement (AP) Test Fee Program

    Federal Register 2010, 2011, 2012, 2013, 2014

    2013-04-02

    ... Applications for New Awards; Advanced Placement (AP) Test Fee Program AGENCY: Office of Elementary and Secondary Education, Department of Education. ACTION: Notice. Overview Information Advanced Placement Test... Announcement I. Funding Opportunity Description Purpose of Program: The AP Test Fee program awards grants...

  20. Engineering industrial yeast for renewable advanced biofuels applications

    Technology Transfer Automated Retrieval System (TEKTRAN)

    The industrial yeast Saccharomyces cerevisiae is a candidate for the next-generation biocatalyst development due to its unique genomic background and robust performance in fermentation-based production. In order to meet challenges of renewable and sustainable advanced biofuels conversion including ...

  1. Clinical Application and Research Advances of CT Myocardial Perfusion Imaging.

    PubMed

    2016-06-10

    Computed tomography (CT)-based myocardial perfusion imaging (CTP)has been widely recognized as a one-station solution for the imaging of myocardial ischemia-related diseases. This article reviews the clinical scanning protocols,analytical methods,and research advances of CTP in recent years and briefly discusses its limitations and future development. PMID:27469926

  2. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography.

    PubMed

    Tarrio, Charles; Grantham, Steven; Squires, Matthew B; Vest, Robert E; Lucatorto, Thomas B

    2003-01-01

    Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer extreme-ultraviolet stepper mirrors require the highest attainable reflectivity at 13 nm (nearly 70 %), but the central wavelength of the reflectivity of these mirrors must be measured with a wavelength repeatability of 0.001 nm and the peak reflectivity of the reflective masks with a repeatability of 0.12 %. We report on two upgrades of our NIST/DARPA Reflectometry Facility that have given us the ability to achieve 0.1 % repeatability and 0.3 % absolute uncertainty in our reflectivity measurements. A third upgrade, a monochromator with thermal and mechanical stability for improved wavelength repeatability, is currently in the design phase.

  3. Single and multilayer metamaterials fabricated by nanoimprint lithography

    NASA Astrophysics Data System (ADS)

    Bergmair, I.; Dastmalchi, B.; Bergmair, M.; Saeed, A.; Hilber, W.; Hesser, G.; Helgert, C.; Pshenay-Severin, E.; Pertsch, T.; Kley, E. B.; Hübner, U.; Shen, N. H.; Penciu, R.; Kafesaki, M.; Soukoulis, C. M.; Hingerl, K.; Muehlberger, M.; Schoeftner, R.

    2011-08-01

    We demonstrate for the first time a fast and easy nanoimprint lithography (NIL) based stacking process of negative index structures like fishnet and Swiss-cross metamaterials. The process takes a few seconds, is cheap and produces three-dimensional (3D) negative index materials (NIMs) on a large area which is suitable for mass production. It can be performed on all common substrates even on flexible plastic foils. This work is therefore an important step toward novel and breakthrough applications of NIMs such as cloaking devices, perfect lenses and magnification of objects using NIM prisms. The optical properties of the fabricated samples were measured by means of transmission and reflection spectroscopy. From the measured data we retrieved the effective refractive index which is shown to be negative for a wavelength around 1.8 µm for the fishnet metamaterial while the Swiss-cross metamaterial samples show a distinct resonance at wavelength around 1.4 µm.

  4. Micro stereo lithography and fabrication of 3D microdevices

    NASA Astrophysics Data System (ADS)

    Varadan, Vijay K.; Varadan, Vasundara V.

    1999-08-01

    Micro Stereo Lithography (MSL) is a poor man's LIGA for fabricating high aspect ratio MEMS devices in UV curable semiconducting polymers using either two computer-controlled low inertia galvanometric mirrors with the aid of focusing lens or an array of optical fibers. For 3D MEMS devices, the polymers need to have conductive and possibly piezoelectric or ferroelectric properties. Such polymers are being developed at Penn State resulting in microdevices for fluid and drug delivery. Applications may include implanted medical delivery systems, chemical and biological instruments, fluid delivery in engines, pump coolants and refrigerants for local cooling of electronic components. With the invention of organic thin film transistor, now it is possible to fabricate 3D polymeric MEMS devices with built-in-electronics similar to silicon based microelectronics. In this paper, a brief introduction of MSL system is presented followed by a detailed design and development of micro pumps using this approach.

  5. Interpreting cost of ownership for mix-and-match lithography

    NASA Astrophysics Data System (ADS)

    Levine, Alan L.; Bergendahl, Albert S.

    1994-05-01

    Cost of ownership modeling is a critical and emerging tool that provides significant insight into the ways to optimize device manufacturing costs. The development of a model to deal with a particular application, mix-and-match lithography, was performed in order to determine the level of cost savings and the optimum ways to create these savings. The use of sensitivity analysis with cost of ownership allows the user to make accurate trade-offs between technology and cost. The use and interpretation of the model results are described in this paper. Parameters analyzed include several manufacturing considerations -- depreciation, maintenance, engineering and operator labor, floorspace, resist, consumables and reticles. Inherent in this study is the ability to customize this analysis for a particular operating environment. Results demonstrate the clear advantages of a mix-and-match approach for three different operating environments. These case studies also demonstrate various methods to efficiently optimize cost savings strategies.

  6. Field Emitter Arrays and Displays Produced by Ion Tracking Lithography

    SciTech Connect

    Felter, T E; Musket, R G; Bernhardt, A F

    2004-12-28

    When ions of sufficient electronic energy loss traverse a dielectric film or foil, they alter the chemical bonding along their nominally straight path within the material. A suitable etchant can quickly dissolve these so-called latent tracks leaving holes of small diameter ({approx}10nm) but long length - several microns. Continuing the etching process gradually increases the diameter reproducibly and uniformly. The trackable medium can be applied as a uniform film onto large substrates. The small, monodisperse holes produced by this track etching can be used in conjunction with additional thin film processing to create functional structures attached to the substrate. For example, Lawrence Livermore National Laboratory and Candescent Technologies Corporation (CTC) co-developed a process to make arrays of gated field emitters ({approx}100nm diameter electron guns) for CTC's ThinCRT{trademark} displays, which have been fabricated to diagonal dimensions > 13. Additional technological applications of ion tracking lithography will be briefly covered.

  7. Nanoimprint lithography for functional three-dimensional patterns.

    PubMed

    Ofir, Yuval; Moran, Isaac W; Subramani, Chandramouleeswaran; Carter, Kenneth R; Rotello, Vincent M

    2010-08-24

    Nanoimprint lithography (NIL) is viewed as an alternative nanopatterning technique to traditional photolithography, allowing micrometer-scale and sub-hundred-nanometer resolution as well as three-dimensional structure fabrication. In this Research News article we highlight current activities towards the use of NIL in patterning active or functional materials, and the application of NIL in patterning materials that present both chemistry and structure/topography in the patterned structures, which provide scaffolds for subsequent manipulation. We discuss and give examples of the various materials and chemistries that have been used to create functional patterns and their implication in various fields as electronic and magnetic devices, optically relevant structures, biologically important surfaces, and 3D particles. PMID:20552602

  8. Designing Responsive Buckled Surfaces by Halftone Gel Lithography

    NASA Astrophysics Data System (ADS)

    Kim, Jungwook; Hanna, James A.; Byun, Myunghwan; Santangelo, Christian D.; Hayward, Ryan C.

    2012-03-01

    Self-actuating materials capable of transforming between three-dimensional shapes have applications in areas as diverse as biomedicine, robotics, and tunable micro-optics. We introduce a method of photopatterning polymer films that yields temperature-responsive gel sheets that can transform between a flat state and a prescribed three-dimensional shape. Our approach is based on poly(N-isopropylacrylamide) copolymers containing pendent benzophenone units that allow cross-linking to be tuned by irradiation dose. We describe a simple method of halftone gel lithography using only two photomasks, wherein highly cross-linked dots embedded in a lightly cross-linked matrix provide access to nearly continuous, and fully two-dimensional, patterns of swelling. This method is used to fabricate surfaces with constant Gaussian curvature (spherical caps, saddles, and cones) or zero mean curvature (Enneper’s surfaces), as well as more complex and nearly closed shapes.

  9. Super diffraction lithography (SDL): fine random line pattern formation by single-exposure with binary mask

    NASA Astrophysics Data System (ADS)

    Nakao, S.; Abe, J.; Nakae, A.; Imai, A.; Narimatsu, K.; Suko, K.

    2005-05-01

    A novel RET named Super Diffraction Lithography (SDL), which enables 90~80 nm random line by single exposure in KrF wavelength, has been developed. A pair of bright lines, which sandwiches binary or Atten-PSM line and is surrounded by attenuating non-phase-shifting (Atten-NPS) area, is formed on a mask. The Atten-NPS area of the mask is composed with a small pad array whose pitch is finer than the resolution limit of projection optics. Then, this mask can be fabricated with a single layer patterning. When this mask is illuminated by an obliquely incident light with a specific incident angle, very sharp dark line image is formed at center of the bright lines. Because the outside of the pair is Atten-NPS area, image intensity for this area can become much higher than a slice level of the central dark line image, resulting in no resist pattern at the outside of the pair. By application of a sub-resolution assist feature (SRAF) for semi-dense pattern, fine line can be imaged throughout pattern pitch. Then, utilizing SDL, very fine random line can be formed by SINGLE EXPOSURE of SIMPLE STRUCTURE MASK. In KrF exposure at NA=0.82, 90 nm line with pitch of down to 240 nm can be achieved by a binary mask. Using 6% transmission Atten-PSM, 80 nm becomes possible. Moreover, 50 nm isolated line becomes feasible in KrF exposure by application of high transmission Atten-PSM. We believe that SDL is the most cost-effective and easily applicable RET for gate pattern formation in advanced logic devices.

  10. Clinical applications of advanced lipoprotein testing in diabetes mellitus

    PubMed Central

    Moin, Danyaal S; Rohatgi, Anand

    2011-01-01

    Traditional lipid profiles often fail to fully explain the elevated cardiovascular risk of individuals with diabetes mellitus. Advanced lipoprotein testing offers a novel means to evaluate dyslipidemia and refine risk estimation. Numerous observational studies have demonstrated a characteristic pattern of elevated levels of small, dense LDL particles, out of proportion to traditional lipid levels, in patients with both diabetes mellitus and the metabolic syndrome. Commonly used glucose and lipid-lowering agents have varied effects in patients with diabetes on both LDL and HDL subfractions. The exact role of advanced lipoprotein testing in patients with diabetes mellitus and the metabolic syndrome remains unclear but may offer improved assessment of cardiovascular risk compared with traditional lipid measurements. PMID:22162979

  11. Advances in the biomedical applications of the EELA Project.

    PubMed

    Hernández, Vicente; Blanquer, Ignacio; Aparicio, Gabriel; Isea, Raúl; Chaves, Juan Luis; Hernández, Alvaro; Mora, Henry Ricardo; Fernández, Manuel; Acero, Alicia; Montes, Esther; Mayo, Rafael

    2007-01-01

    In the last years an increasing demand for Grid Infrastructures has resulted in several international collaborations. This is the case of the EELA Project, which has brought together collaborating groups of Latin America and Europe. One year ago we presented this e-infrastructure used, among others, by the biomedical groups for the studies of oncological analysis, neglected diseases, sequence alignments and computational phylogenetics. After this period, the achieved advances are summarised in this paper.

  12. Digital Mammography Imaging: Breast Tomosynthesis and Advanced Applications

    PubMed Central

    Helvie, Mark A.

    2011-01-01

    Synopsis This article discusses recent developments in advanced derivative technologies associated with digital mammography. Digital breast tomosynthesis – its principles, development, and early clinical trials are reviewed. Contrast enhanced digital mammography and combined imaging systems with digital mammography and ultrasound are also discussed. Although all these methods are currently research programs, they hold promise for improving cancer detection and characterization if early results are confirmed by clinical trials. PMID:20868894

  13. Fabrication of metallic nanowires and nanoribbons using laser interference lithography and shadow lithography

    SciTech Connect

    Park, Joong- Mok; Nalwa, Kanwar Singh; Leung, Wai; Constant, Kristen; Chaudhary, Sumit; Ho, Kai-Ming

    2010-04-30

    Ordered and free-standing metallic nanowires were fabricated by e-beam deposition on patterned polymer templates made by interference lithography. The dimensions of the nanowires can be controlled through adjustment of deposition conditions and polymer templates. Grain size, polarized optical transmission and electrical resistivity were measured with ordered and free-standing nanowires.

  14. Modern night vision goggles for advanced infantry applications

    NASA Astrophysics Data System (ADS)

    Estrera, Joseph P.; Ostromek, Timothy E.; Isbell, Wayne; Bacarella, Antonio V.

    2003-09-01

    Northrop Grumman Electro-Optical Systems (NGEOS) has concentrated in recent years on the development of advanced night vision goggle (NVG) systems. These NVGs developments concentrate on past operational deficiencies such as high light/bright source conditions during military operations in urban terrain (MOUT), poor individual movement technique (IMT) infantry operations, and obscured battlefield and reduced weather conditions. The first area of NVG advancement involves direct image intensifier (I2) replacement involving automatic gated power supply technology for wide dynamic NVG operation and advanced Generation III halo free I2 technology for reduction of NVG image halo and "blooming" artifacts. The second significant development area is NVG individual movement technique (IMT) deficiencies such as reduced field of view, reduced depth perception, center of gravity problems, and limited operation flexibility. These issues of NVG IMT have resulted in the development of an IMT enhanced night vision goggle for the U.S. Army's enhanced night vision goggle (ENVG). Finally, Northrop Grumman EOS is developing a NVG with the capability of producing optimized real-time image fusion from an image intensified sensor and uncooled long wavelength infrared (LWIR) sensor. This new technology allows for optimum imaging in battlefield obscured and laser polluted environment. These image fusion NVG development efforts have concentrated on both optical overlay image fusion and digital image fusion. This paper will compare and contrast these two types of image fusion technologies.

  15. Development of an advanced high-temperature fastener system for advanced aerospace vehicle application

    NASA Technical Reports Server (NTRS)

    Kull, F. R.

    1975-01-01

    The results of a program to develop a lightweight high temperature reusable fastening system for aerospace vehicle thermal protection system applications are documented. This feasibility program resulted in several fastener innovations which will meet the specific needs of the heat shield application. Three systems were designed from Hayes 188 alloy and tested by environmental exposure and residual mechanical properties. The designs include a clinch stud with a collar retainer, a weld stud with a split ring retainer, and a caged stud with a collar retainer. The results indicated that a lightweight, reusable, high temperature fastening system can be developed for aerospace vehicle application.

  16. Millimeter-Wave Imaging Technology Advancements for Plasma Diagnostics Applications

    NASA Astrophysics Data System (ADS)

    Kong, Xiangyu

    To realize fusion plant, the very first step is to understand the fundamental physics of materials under fusion conditions, i.e. to understand fusion plasmas. Our research group, Plasma Diagnostics Group, focuses on developing advanced tools for physicists to extract as much information as possible from fusion plasmas at millions degrees. The Electron Cyclotron Emission Imaging (ECEI) diagnostics is a very useful tool invented in this group to study fusion plasma electron temperature and it fluctuations. This dissertation presents millimeter wave imaging technology advances recently developed in this group to improve the ECEI system. New technologies made it more powerful to image and visualize magneto-hydrodynamics (MHD) activities and micro-turbulence in fusion plasmas. Topics of particular emphasis start from development of miniaturized elliptical substrate lens array. This novel substrate lens array replaces the previous generation substrate lens, hyper-hemispherical substrate lens, in terms of geometry. From the optical performance perspective, this substitution not only significantly simplifies the optical system with improved optical coupling, but also enhances the RF/LO coupling efficiency. By the benefit of the mini lens focusing properties, a wideband dual-dipole antenna array is carefully designed and developed. The new antenna array is optimized simultaneously for receiving both RF and LO, with sharp radiation patterns, low side-lobe levels, and less crosstalk between adjacent antennas. In addition, a high frequency antenna is also developed, which extends the frequency limit from 145 GHz to 220 GHz. This type of antenna will be used on high field operation tokamaks with toroidal fields in excess of 3 Tesla. Another important technology advance is so-called extended bandwidth double down-conversion electronics. This new electronics extends the instantaneous IF coverage from 2 to 9.2 GHz to 2 to 16.4 GHz. From the plasma point of view, it means that the

  17. Overview of Lithography: Challenges and Metrologies

    NASA Astrophysics Data System (ADS)

    Levinson, Harry J.

    2003-09-01

    Semiconductor microlithography is rapidly reaching a point where it becomes exceedingly difficult to shrink features at historical rates. We will no longer be able to increase process windows by going to shorter wavelengths with optical lithography, because we are running out of useable wavelengths. This necessitates either the implementation of processes with very small process windows or a transition to radically new types of lithographic technologies. Either situation presents numerous challenges to lithographers and metrologists. Particularly daunting are the requirements for gate linewidth control for microprocessors. Reducing variation requires improvement in the components of variation, each of which must be smaller than the total result. In order to improve a particular parameter, such as CD variation, metrology must be adequate for identifying improvements in the components of that parameter, not just the total. This places very tight requirements on metrology capability. Departing from optical lithography into the Brave New World of Next Generation Lithography will necessitate new metrology capabilities in several areas, not just the measurement of features on wafers. Creating the capabilities that will be needed in the future requires that funding be available for the requisite development. The need for huge amounts of funding to develop new lithographic technologies will likely necessitate a slowing down in the pace at which we shrink features. It is absolutely essential that a balance is re-established between the prices that purchasers of chips are willing to pay and chip development and manufacturing costs. This will be very challenging with 300 mm wafer fabs coming on-line, since low chip prices have historically been associated with overcapacity in the semiconductor industry, and it is anticipated that new lithographic technologies will be very expensive.

  18. Image-projection ion-beam lithography

    SciTech Connect

    Miller, P.A. )

    1989-09-01

    Image-projection ion-beam lithography is an attractive alternative for submicron patterning because it may provide high throughput; it uses demagnification to gain advantages in reticle fabrication, inspection, and lifetime; and it enjoys the precise deposition characteristics of ions which cause essentially no collateral damage. This lithographic option involves extracting low-mass ions (e.g., He{sup +} ) from a plasma source, transmitting the ions at low voltage through a stencil reticle, and then accelerating and focusing the ions electrostatically onto a resist-coated wafer. While the advantages of this technology have been demonstrated experimentally by the work of IMS (Austria), many difficulties still impede extension of the technology to the high-volume production of microelectronic devices. We report a computational study of a lithography system designed to address problem areas in field size, telecentricity, and chromatic and geometric aberration. We present a novel ion-column-design approach and conceptual ion-source and column designs which address these issues. We find that image-projection ion-beam technology should in principle meet high-volume-production requirements. The technical success of our present relatively compact-column design requires that a glow-discharge-based ion source (or equivalent cold source) be developed and that moderate further improvement in geometric aberration levels be obtained. Our system requires that image predistortion be employed during reticle fabrication to overcome distortion due to residual image nonlinearity and space-charge forces. This constitutes a software data preparation step, as do correcting for distortions in electron lithography columns and performing proximity-effect corrections. Areas needing further fundamental work are identified.

  19. EUV lithography imaging using novel pellicle membranes

    NASA Astrophysics Data System (ADS)

    Pollentier, Ivan; Vanpaemel, Johannes; Lee, Jae Uk; Adelmann, Christoph; Zahedmanesh, Houman; Huyghebaert, Cedric; Gallagher, Emily E.

    2016-03-01

    EUV mask protection against defects during use remains a challenge for EUV lithography. A stand-off protective membrane - a pellicle - is targeted to prevent yield losses in high volume manufacturing during handling and exposure, just as it is for 193nm lithography. The pellicle is thin enough to transmit EUV exposure light, yet strong enough to remain intact and hold any particles out of focus during exposure. The development of pellicles for EUV is much more challenging than for 193nm lithography for multiple reasons including: high absorption of most materials at EUV wavelength, pump-down sequences in the EUV vacuum system, and exposure to high intensity EUV light. To solve the problems of transmission and film durability, various options have been explored. In most cases a thin core film is considered, since the deposition process for this is well established and because it is the simplest option. The transmission specification typically dictates that membranes are very thin (~50nm or less), which makes both fabrication and film mechanical integrity difficult. As an alternative, low density films (e.g. including porosity) will allow thicker membranes for a given transmission specification, which is likely to improve film durability. The risk is that the porosity could influence the imaging. At imec, two cases of pellicle concepts based on reducing density have been assessed : (1) 3D-patterned SiN by directed self-assembly (DSA), and (2) carbon nanomaterials such as carbon nanotubes (CNT) and carbon nanosheets (CNS). The first case is based on SiN membranes that are 3D-patterned by Directed Self Assembly (DSA). The materials are tested relative to the primary specifications: EUV transmission and film durability. A risk assessment of printing performance is provided based on simulations of scattered energy. General conclusions on the efficacy of various approaches will provided.

  20. Film stacking architecture for immersion lithography process

    NASA Astrophysics Data System (ADS)

    Goto, Tomohiro; Sanada, Masakazu; Miyagi, Tadashi; Shigemori, Kazuhito; Kanaoka, Masashi; Yasuda, Shuichi; Tamada, Osamu; Asai, Masaya

    2008-03-01

    In immersion lithography process, film stacking architecture will be necessary due to film peeling. However, the architecture will restrict lithographic area within a wafer due to top side EBR accuracy In this paper, we report an effective film stacking architecture that also allows maximum lithographic area. This study used a new bevel rinse system on RF3 for all materials to make suitable film stacking on the top side bevel. This evaluation showed that the new bevel rinse system allows the maximum lithographic area and a clean wafer edge. Patterning defects were improved with suitable film stacking.

  1. The next generation of maskless lithography

    NASA Astrophysics Data System (ADS)

    Diez, Steffen

    2016-02-01

    The essential goal for fast prototyping of microstructures is to reduce the cycle time. Conventional methods up to now consist of creating designs with a CAD software, then fabricating or purchasing a Photomask and finally using a mask aligner to transfer the pattern to the photoresist. The new Maskless Aligner (MLA) enables to expose the pattern directly without fabricating a mask, which results in a significantly shorter prototyping cycle. To achieve this short prototyping cycle, the MLA has been improved in many aspects compared to other direct write lithography solutions: exposure speed, user interface, ease of operation and flexibility.

  2. Wave and Particle in Molecular Interference Lithography

    SciTech Connect

    Juffmann, Thomas; Truppe, Stefan; Geyer, Philipp; Major, Andras G.; Arndt, Markus; Deachapunya, Sarayut; Ulbricht, Hendrik

    2009-12-31

    The wave-particle duality of massive objects is a cornerstone of quantum physics and a key property of many modern tools such as electron microscopy, neutron diffraction or atom interferometry. Here we report on the first experimental demonstration of quantum interference lithography with complex molecules. Molecular matter-wave interference patterns are deposited onto a reconstructed Si(111) 7x7 surface and imaged using scanning tunneling microscopy. Thereby both the particle and the quantum wave character of the molecules can be visualized in one and the same image. This new approach to nanolithography therefore also represents a sensitive new detection scheme for quantum interference experiments.

  3. Plasma formed ion beam projection lithography system

    DOEpatents

    Leung, Ka-Ngo; Lee, Yung-Hee Yvette; Ngo, Vinh; Zahir, Nastaran

    2002-01-01

    A plasma-formed ion-beam projection lithography (IPL) system eliminates the acceleration stage between the ion source and stencil mask of a conventional IPL system. Instead a much thicker mask is used as a beam forming or extraction electrode, positioned next to the plasma in the ion source. Thus the entire beam forming electrode or mask is illuminated uniformly with the source plasma. The extracted beam passes through an acceleration and reduction stage onto the resist coated wafer. Low energy ions, about 30 eV, pass through the mask, minimizing heating, scattering, and sputtering.

  4. Substrate conformal imprint lithography for nanophotonics

    NASA Astrophysics Data System (ADS)

    Verschuuren, M. A.

    2010-03-01

    The field of nano-photonics studies the interaction and control of light with dielectric, semiconductor and metal structures which are comparable in size or smaller than the vacuum wavelength of light. In this thesis we present Substrate Conformal Imprint Lithography (SCIL) as a novel wafer-scale nanoimprint method with nano-scale resolution which combines the resolution and accuracy of rigid stamps with the flexibility of soft stamp methods. Chapter two describes the SCIL soft nanoimprint process and introduces a novel silica sol-gel imprint resist. A new soft rubber stamp material is described which enables sub-10 nm resolution. We demonstrate that SCIL imprinted patterns have on average less than 0.1 nm distortion and demonstrate sub-50 nm overlay alignment. Chapter 3 demonstrates 30 nm dense structures and features with aspect ratios from 1/640 up to 5. Imprinted sol-gel patterns can be transferred into underlying materials while maintaining sub-10 nm resolution. Two methods are demonstrated to pattern noble metals in particle arrays and sub-wavelength hole arrays. SCIL is applied to produce photonic crystal power InGaN LEDs which exhibit strong modification of the emission pattern. Chapter 4 demonstrates a relatively simple route towards 3D woodpile type photonic crystals. We show a four layer woodpile type structure with 70 nm features on a 240 nm pitch, which is temperature stable up to 1000 C. Chapter 5 demonstrates a novel fabrication route to large area nano hole arrays, which are interesting as angle independent color filters and for sensor applications. A solid state index matched hole array exhibits SPP mediated super resonant transmission. Chapter 6 treats single mode polarization stabilized Vertical Cavity Surface Emitting Lasers (VCSELs). The lasers produced by SCIL exhibit equal performance as devices produced by e-beam. VCSELs with SCIL imprinted sub-wavelength gratings increase the laser efficiency by 29 % compared to conventional gratings

  5. Proposed advanced satellite applications utilizing space nuclear power systems

    NASA Technical Reports Server (NTRS)

    Bailey, Patrick G.; Isenberg, Lon

    1990-01-01

    A review of the status of space nuclear reactor systems and their possible applications is presented. Such systems have been developed over the past twenty years and are capable of use in various military and civilian applications in the 5-1000-kWe power range. The capabilities and limitations of the currently proposed nuclear reactor systems are summarized. Statements of need are presented from DoD, DOE, and NASA. Safety issues are identified, and if they are properly addressed they should not pose a hindrance. Applications are summarized for the DoD, DOE, NASA, and the civilian community. These applications include both low- and high-altitude satellite surveillance missions, communications satellites, planetary probes, low- and high-power lunar and planetary base power systems, broadband global telecommunications, air traffic control, and high-definition television.

  6. Silk-microfluidics for advanced biotechnological applications: A progressive review.

    PubMed

    Konwarh, Rocktotpal; Gupta, Prerak; Mandal, Biman B

    2016-01-01

    Silk based biomaterials have not only carved a unique niche in the domain of regenerative medicine but new avenues are also being explored for lab-on-a-chip applications. It is pertinent to note that biospinning of silk represents nature's signature microfluidic-maneuver. Elucidation of non-Newtonian flow of silk in the glands of spiders and silkworms has inspired researchers to fabricate devices for continuous extrusion and concentration of silk. Microfluidic channel networks within porous silk scaffolds ensure optimal nutrient and oxygen supply apart from serving as precursors for vascularization in tissue engineering applications. On the other hand, unique topographical features and surface wettability of natural silk fibers have inspired development of a number of simple and cost-effective devices for applications like blood typing and chemical sensing. This review mirrors the recent progress and challenges in the domain of silk-microfluidics for prospective avant-garde applications in the realm of biotechnology. PMID:27165254

  7. Recent advances in metal hydrides for clean energy applications

    SciTech Connect

    Ronnebro, Ewa; Majzoub, Eric H.

    2013-06-01

    Metal hydrides are a fascinating class of materials that can be utilized for a surprising variety of clean energy applications, including smart solar collectors, smart windows, sensors, thermal energy storage, and batteries, in addition to their traditional application for hydrogen storage. Over the past decade, research on metal hydrides for hydrogen storage increased due to global governmental incentives and an increased focus on hydrogen storage research for polymer electrolyte membrane fuel cell operation. Tremendous progress has been made in so-called complex metal hydrides for hydrogen storage applications with the discovery of many new hydrides containing covalently bound complex anions. Many of these materials have applications beyond hydrogen storage and are being investigated for lithium-ion battery separator and anode materials. In this issue of MRS Bulletin , we present the state of the art of key evolving metal-hydride-based clean energy technologies with an outlook toward future needs.

  8. Advances and Applications of Single Cell Sequencing Technologies

    PubMed Central

    Wang, Yong; Navin, Nicholas E.

    2015-01-01

    Single cell sequencing (SCS) has emerged as a powerful new set of technologies for studying rare cells and delineating complex populations. Over the past 5 years, SCS methods for DNA and RNA have had a broad impact on many diverse fields of biology, including microbiology, neurobiology, development, tissue mosaicism, immunology and cancer research. In this review, we will discuss SCS technologies and applications, as well as translational applications in the clinic. PMID:26000845

  9. Process Integration Study [Advanced Industrial Heat Pump Applications and Evaluations

    SciTech Connect

    Eastwood, A.

    1992-06-01

    This work was carried out in two phases: Phase 1; identification of opportunities for heat pumps in industrial applications and Phase 2; evaluation of heat pumps in industrial applications. In Phase 1, pinch analysis was applied to several industrial sites to identify the best opportunities for heat pumping and other forms of heat integration. In Phase 2, more detailed analyses were undertaken, including the evaluation of a heat pump installed as a recommendation of Phase 1.

  10. Application of advanced polymeric materials for controlled release pesticides

    NASA Astrophysics Data System (ADS)

    Rahim, M.; Hakim, M. R.; Haris, H. M.

    2016-08-01

    The objective of this work was to study the capability of advanced polymeric material constituted by chitosan and natural rubber matrices for controlled release of pesticides (1-hydroxynaphthalene and 2-hydroxynaphthalene) in aqueous solution. The released amount of pesticides was measured spectrophotometrically from the absorbance spectra applying a standardized curve. The release of the pesticides was studied into refreshing and non-refreshing neutral aqueous media. Interestingly, formulation successfully indicated a consistent, controlled and prolonged release of pesticides over a period of 35 days.

  11. Advanced packaging technology for high frequency photonic applications

    SciTech Connect

    Armendariz, M.G.; Hadley, G.R.; Warren, M.E.

    1996-03-01

    An advanced packaging concept has been developed for optical devices. This concept allows multiple fibers to be coupled to photonic integrated circuits, with no fiber penetration of the package walls. The principles used to accomplish this concept involves a second-order grating to couple light in or out of the photonic circuit, and a binary optic lens which receives this light and focuses it into a single-mode optical fiber. Design, fabrication and electrical/optical measurements of this packaging concept are described.

  12. Advanced Signal Analysis for Forensic Applications of Ground Penetrating Radar

    SciTech Connect

    Steven Koppenjan; Matthew Streeton; Hua Lee; Michael Lee; Sashi Ono

    2004-06-01

    Ground penetrating radar (GPR) systems have traditionally been used to image subsurface objects. The main focus of this paper is to evaluate an advanced signal analysis technique. Instead of compiling spatial data for the analysis, this technique conducts object recognition procedures based on spectral statistics. The identification feature of an object type is formed from the training vectors by a singular-value decomposition procedure. To illustrate its capability, this procedure is applied to experimental data and compared to the performance of the neural-network approach.

  13. Ceramic applications in the advanced Stirling automotive engine

    NASA Technical Reports Server (NTRS)

    Tomazic, W. A.; Cairelli, J. E.

    1978-01-01

    The requirements of the ideal Stirling cycle, as well as basic types of practical engines are described. Advantages, disadvantages, and problem areas of these Stirling engines are discussed. The potential for ceramic components is also considered. Currently ceramics are used in only two areas, the air preheater and insulating tiles between the burner and the heater head. For the advanced Stirling engine to achieve high efficiency and low cost, the principal components are expected to be made from ceramic materials, including the heater head, air preheater, regenerator, the burner and the power piston. Supporting research and technology programs for ceramic component development are briefly described.

  14. Lithography-free large-area metamaterials for stable thermophotovoltaic energy conversion

    DOE PAGES

    Coppens, Zachary J.; Kravchenko, Ivan I.; Valentine, Jason G.

    2016-02-08

    A large-area metamaterial thermal emitter is fabricated using facile, lithography-free techniques. The device is composed of conductive oxides, refractory ceramics, and noble metals and shows stable, selective emission after exposure to 1173 K for 22 h in oxidizing and inert atmospheres. Lastly, the results indicate that the metamaterial can be used to achieve high-performance thermophotovoltaic devices for applications such as portable power generation.

  15. Nanosphere lithography for advanced all fiber Sers probes

    NASA Astrophysics Data System (ADS)

    Pisco, Marco; Galeotti, Francesco; Quero, Giuseppe; Grisci, Giorgio; Micco, Alberto; Mercaldo, L.; Delli Veneri, P.; Cusano, Andrea

    2016-05-01

    In this work, we report a straightforward and cost-effective fabrication route for the development of nano-patterned optical fiber tips. The technique is based on self-assembling polystyrene microspheres at the air/water interface and on their successive transferring on the fiber tip of single mode optical fiber. By applying to the fiber further treatments like particle size reduction, metal coating and sphere removal, different periodic structures have been conveniently realized. The morphological analysis reveals indeed the successful creation on the optical fiber tip of regular metallic-dielectric spheres' arrays as well as metallic patterns with dimensional features down to a submicron scale. Finally, as proof of concept, we demonstrated the capability of the realized patterns to work as efficient Surface Enhanced Raman Spectroscopy (SERS) fiber probes.

  16. A survey of advanced excimer optical imaging and lithography

    NASA Astrophysics Data System (ADS)

    Matsumoto, Koichi; Suwa, Kyoichi

    1998-11-01

    The first item discussed in this paper is to estimate the future trend regarding minimum geometry and the optical parameters, such as NA and wavelength. Simulations based on aerial images are performed for the estimation. The resolution limit is defined as a minimum feature size which retains practical depth of focus (DOF). Pattern geometry is classified into two categories, which are dense lines and isolated lines. Available wavelengths are assumed to be KrF excimer laser (λ=248 nm), ArF excimer laser (λ=193 nm) and F2 excimer laser (λ=157 nm). Based upon the simulation results, the resolution limit is estimated for each geometry and each wavelength. The second item is to survey ArF optics. At present, the ArF excimer laser is regarded as one of the most promising candidates as a next-generation light source. Discussions are ranging over some critical issues. The lifetime of ArF optics supposedly limited by the radiation compaction of silica glass is estimated in comparison with KrF optics. Availability of calcium fluoride (CaF2) is also discussed. As a designing issue, a comparative study is made about the optical configuration, dioptric or catadioptric. In the end, our resist-based performance is shown.

  17. New spin-on metal hardmask materials for lithography processes

    NASA Astrophysics Data System (ADS)

    Yao, Huirong; Mullen, Salem; Wolfer, Elizabeth; Rahman, Dalil; Anyadiegwu, Clement; Mckenzie, Douglas; Dioses, Alberto; Cho, Joonyeon; Padmanaban, Munirathna

    2013-03-01

    Since the critical dimensions in integrated circuit (IC) device fabrication continue to shrink below 32 nm, multilayer stacks with alternating etch selectivities are required for successful pattern transfer from the exposed photoresist to the substrate. Inorganic resist underlayer materials are used as hard masks in reactive ion etching (RIE) with oxidative gases. The conventional silicon hardmask has demonstrated good reflectivity control and reasonable etch selectivity. However, some issues such as the rework of trilayer stacks and cleaning of oxide residue by wet chemistry are challenging problems for manufacturability. The present work reveals novel spin-on underlayer materials containing significant amounts of metal oxides in the film after baking at normal processing conditions. Such an inorganic metal hardmask (MHM) has excellent etch selectivity in plasma etch processes of the trilayer stack. The composition has good long term shelf life and pot life stability based on solution LPC analysis and wafer defect studies, respectively. The material absorbs DUV wavelengths and can be used as a spin-on inorganic or hybrid antireflective coating to control substrate reflectivity under DUV exposure of photoresist. Some of these metal-containing materials can be used as an underlayer in EUV lithography to significantly enhance photospeed. Specific metal hard masks are also developed for via or trench filling applications in IRT processes. The materials have shown good coating and lithography performance with a film thicknesses as low as 10 nm under ArF dry or immersion conditions. In addition, the metal oxide films or residues can be partially or completely removed by using various wet-etching solutions at ambient temperature.

  18. 28nm node process optimization: a lithography centric view

    NASA Astrophysics Data System (ADS)

    Seltmann, Rolf

    2014-10-01

    Many experts claim that the 28nm technology node will be the most cost effective technology node forever. This results from primarily from the cost of manufacturing due to the fact that 28nm is the last true Single Patterning (SP) node. It is also affected by the dramatic increase of design costs and the limited shrink factor of the next following nodes. Thus, it is assumed that this technology still will be alive still for many years. To be cost competitive, high yields are mandatory. Meanwhile, leading edge foundries have optimized the yield of the 28nm node to such a level that that it is nearly exclusively defined by random defectivity. However, it was a long way to go to come to that level. In my talk I will concentrate on the contribution of lithography to this yield learning curve. I will choose a critical metal patterning application. I will show what was needed to optimize the process window to a level beyond the usual OPC model work that was common on previous nodes. Reducing the process (in particular focus) variability is a complementary need. It will be shown which improvements were needed in tooling, process control and design-mask-wafer interaction to remove all systematic yield detractors. Over the last couple of years new scanner platforms were introduced that were targeted for both better productivity and better parametric performance. But this was not a clear run-path. It needed some extra affords of the tool suppliers together with the Fab to bring the tool variability down to the necessary level. Another important topic to reduce variability is the interaction of wafer none-planarity and lithography optimization. Having an accurate knowledge of within die topography is essential for optimum patterning. By completing both the variability reduction work and the process window enhancement work we were able to transfer the original marginal process budget to a robust positive budget and thus ensuring high yield and low costs.

  19. 78 FR 49061 - Valuation of Federal Coal for Advance Royalty Purposes and Information Collection Applicable to...

    Federal Register 2010, 2011, 2012, 2013, 2014

    2013-08-12

    ... Applicable to All Solid Minerals Leases; Proposed Rule #0;#0;Federal Register / Vol. 78, No. 155 / Monday... Purposes and Information Collection Applicable to All Solid Minerals Leases AGENCY: Office of Natural... solid minerals leases and also are necessary to implement the EPAct Federal coal advance...

  20. Economic consequences of high throughput maskless lithography

    NASA Astrophysics Data System (ADS)

    Hartley, John G.; Govindaraju, Lakshmi

    2005-11-01

    Many people in the semiconductor industry bemoan the high costs of masks and view mask cost as one of the significant barriers to bringing new chip designs to market. All that is needed is a viable maskless technology and the problem will go away. Numerous sites around the world are working on maskless lithography but inevitably, the question asked is "Wouldn't a one wafer per hour maskless tool make a really good mask writer?" Of course, the answer is yes, the hesitation you hear in the answer isn't based on technology concerns, it's financial. The industry needs maskless lithography because mask costs are too high. Mask costs are too high because mask pattern generators (PG's) are slow and expensive. If mask PG's become much faster, mask costs go down, the maskless market goes away and the PG supplier is faced with an even smaller tool demand from the mask shops. Technical success becomes financial suicide - or does it? In this paper we will present the results of a model that examines some of the consequences of introducing high throughput maskless pattern generation. Specific features in the model include tool throughput for masks and wafers, market segmentation by node for masks and wafers and mask cost as an entry barrier to new chip designs. How does the availability of low cost masks and maskless tools affect the industries tool makeup and what is the ultimate potential market for high throughput maskless pattern generators?