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Sample records for advanced lithography applications

  1. Advances in nanoimprint lithography and applications in nanofluidic devices

    NASA Astrophysics Data System (ADS)

    Liang, Xiaogan

    The research work presented in this thesis focuses on three topics: (1) studies of several critical aspects of nanoimprint lithography (NIL), including methods of mold pressing, air bubble defects, and dynamic behaviors of liquid resist flow; (2) applications of NIL to the fabrication of novel nanofluidic devices, which can be used for real-time DNA detection; and (3) additional applications of structured stamps or templates in the direct engineering of functional materials. Based upon these topics, the thesis is divided into three parts. The first part describes recent studies of critical techniques of NIL. First, a novel imprint approach using electrostatic force was developed to pattern spin-on resists in ambient environment. Using this Electrostatic Force-Assisted NIL (EFAN) approach, highly uniform imprints over a 4" diameter wafer area and sub-0.5 mum overlay precision were obtained using very simple equipment. Second, another important method for performing step-and-repeat imprint in the atmosphere, dispensing-based NIL, still suffers from air bubble defects formed by feature pinning and the circling of residual air by the merge of multiple resist droplets. However, it was found that the tiny bubbles can be completely absorbed by the liquid resist. The effects of several key parameters, such as bubble size, imprinting pressure, resist viscosity and solubility, and residual layer thickness, on the air dissolution rate were studied experimentally and theoretically. Their impact to the yield and throughput of NIL was also analyzed. Third, a novel method was developed for filling liquid resists into the air gap between the structured mold and the substrate. The method is assisted by dielectrophoresis, caused by electrohydrodynamic force. The second part describes the applications of NIL to making nanofluidic channel devices and device integration. First, a novel imprint-based method was developed to fabricate precisely positioned single nanofluidic channels of

  2. Advanced oxidation scanning probe lithography

    NASA Astrophysics Data System (ADS)

    Ryu, Yu K.; Garcia, Ricardo

    2017-04-01

    Force microscopy enables a variety of approaches to manipulate and/or modify surfaces. Few of those methods have evolved into advanced probe-based lithographies. Oxidation scanning probe lithography (o-SPL) is the only lithography that enables the direct and resist-less nanoscale patterning of a large variety of materials, from metals to semiconductors; from self-assembled monolayers to biomolecules. Oxidation SPL has also been applied to develop sophisticated electronic and nanomechanical devices such as quantum dots, quantum point contacts, nanowire transistors or mechanical resonators. Here, we review the principles, instrumentation aspects and some device applications of o-SPL. Our focus is to provide a balanced view of the method that introduces the key steps in its evolution, provides some detailed explanations on its fundamentals and presents current trends and applications. To illustrate the capabilities and potential of o-SPL as an alternative lithography we have favored the most recent and updated contributions in nanopatterning and device fabrication.

  3. Advanced oxidation scanning probe lithography.

    PubMed

    Ryu, Yu K; Garcia, Ricardo

    2017-04-07

    Force microscopy enables a variety of approaches to manipulate and/or modify surfaces. Few of those methods have evolved into advanced probe-based lithographies. Oxidation scanning probe lithography (o-SPL) is the only lithography that enables the direct and resist-less nanoscale patterning of a large variety of materials, from metals to semiconductors; from self-assembled monolayers to biomolecules. Oxidation SPL has also been applied to develop sophisticated electronic and nanomechanical devices such as quantum dots, quantum point contacts, nanowire transistors or mechanical resonators. Here, we review the principles, instrumentation aspects and some device applications of o-SPL. Our focus is to provide a balanced view of the method that introduces the key steps in its evolution, provides some detailed explanations on its fundamentals and presents current trends and applications. To illustrate the capabilities and potential of o-SPL as an alternative lithography we have favored the most recent and updated contributions in nanopatterning and device fabrication.

  4. Extending lithography with advanced materials

    NASA Astrophysics Data System (ADS)

    Guerrero, Douglas J.

    2014-03-01

    Material evolution has been a key enabler of lithography nodes in the last 30 years. This paper explores the evolution of anti-reflective coatings and their transformation from materials that provide only reflection control to advanced multifunctional layers. It is expected that complementary processes that do not require a change in wavelength will continue to dominate the development of new devices and technology nodes. New device architecture, immersion lithography, negative-tone development, multiple patterning, and directed self-assembly have demonstrated the capabilities of extending lithography nodes beyond what anyone thought would be possible. New material advancements for future technology nodes are proposed.

  5. Advanced photomask fabrication by e-beam lithography for mask aligner applications

    NASA Astrophysics Data System (ADS)

    Weichelt, T.; Bourgin, Y.; Banasch, M.; Zeitner, U. D.

    2016-10-01

    Photomasks contain geometric information that will be transferred to substrates or pre-structured surfaces. Conventional mask aligner lithography in the sense of shadow printing of the photomask suffers from limited achievable resolution. Photomask and substrate are typically separated by an air gap causing diffraction effects and hence affecting the minimum structure size. Even though contact lithography offers a resolution in the wavelengthscale, yield problems and contamination of the photomask are its drawbacks. Using proximity lithography, these problems can be avoided since it profits from a contact-free exposure process. To overcome the resolution limitation of the shadow printing mode more advanced diffraction based photo masks need to be used.

  6. Advances in roll-to-roll imprint lithography for display applications

    NASA Astrophysics Data System (ADS)

    Jeans, Albert; Almanza-Workman, Marcia; Cobene, Robert; Elder, Richard; Garcia, Robert; Gomez-Pancorbo, Fernando; Jackson, Warren; Jam, Mehrban; Kim, Han-Jun; Kwon, Ohseung; Luo, Hao; Maltabes, John; Mei, Ping; Perlov, Craig; Smith, Mark; Taussig, Carl; Jeffrey, Frank; Braymen, Steve; Hauschildt, Jason; Junge, Kelly; Larson, Don; Stieler, Dan

    2010-03-01

    A solution to the problems of roll-to-roll lithography on flexible substrates is presented. We have developed a roll-toroll imprint lithography technique to fabricate active matrix transistor backplanes on flexible webs of polyimide that have a blanket material stack of metals, dielectrics, and semiconductors. Imprint lithography produces a multi-level 3- dimensional mask that is then successively etched to pattern the underlying layers into the desired structures. This process, Self-Aligned Imprint Lithography (SAIL), solves the layer-to-layer alignment problem because all masking levels are created with one imprint step. The processes and equipment required for complete roll-to-roll SAIL fabrication will be described. Emphasis will be placed on the advances in the roll-to-roll imprint process which have enabled us to produce working transistor arrays.

  7. Microfluidic Applications of Soft Lithography

    SciTech Connect

    Rose, K A; Krulevitch, P; Hamilton, J

    2001-04-10

    The soft lithography fabrication technique was applied to three microfluidic devices. The method was used to create an original micropump design and retrofit to existing designs for a DNA manipulation device and a counter biological warfare sample preparation device. Each device presented unique and original challenges to the soft lithography application. AI1 design constraints of the retrofit devices were satisfied using PDMS devices created through variation of soft lithography methods. The micropump utilized the versatility of PDMS, creating design options not available with other materials. In all cases, the rapid processing of soft lithography reduced the fabrication time, creating faster turnaround for design modifications.

  8. Mask requirements for advanced lithography

    NASA Astrophysics Data System (ADS)

    Trybula, Walter J.; Engelstad, Roxann L.

    1998-06-01

    Within the n ext 10 years, sub-100 nm features will be required for state-of-the-industry devices. The tolerances for errors at 100 nm or less are substantially smaller than can be achieved today. A critical element of the error budget is the mask. For the 100 nm generation, the 4x mask image placement requirement is 20 nm with CD requirements as low as 9 nm. The challenge would be significant if the only improvement were to develop superior optical masks. There are multiple advanced technologies that are vying to be the successor to optical lithography. Each of these has a unique mask requirement. The leading contenders for the next generation are 1x x-ray, projection e-beam, ion beam, EUV and cell projection e-beam. The x-ray design is a proximity system that employs a 1x membrane mask. Projection e-beam uses a membrane mask with stabilizing struts. Ion beam lithography employs a stencil membrane mask with a carbon coating. EUV employs a 13 nm radiation source that requires a reflective mask. Cell projection e-beam has 25x or greater image masks that are stitched on the wafer. All the technologies indicated above. Once a total error budget for the mask is known, it is necessary to divide the total into the constituent parts. The major sources of distortion can be categorized into eight areas: mask blank processing, e- beam writing, pattern transfer, pellicle effects, mounting, thermal loadings, dynamic effects during exposure and radiation damage. The distortions introduced by each of these depend upon the type of mask; so, individual mask calculations must be made. The purpose of this paper is to review the modeling requirements of each of the categories and to highlight some results from each of the mask configurations.

  9. Advances in nanoimprint lithography and applications in plasmonic-enhanced electron source

    NASA Astrophysics Data System (ADS)

    Liang, Yixing

    The research work in this thesis comprises of two parts. The first part focuses on nanofabrication techniques for better control of nanostructures, such as line edge roughness control and critical structure dimensions, for improvement in large area lift-off of ultra-thin (sub-40 nm) and ultra-small (sub-20 nm) nanostructures, and for improvement in mold-substrate separation. The second part of this thesis studies one important application of nanoimprint lithography (NIL) in the field of plasmonic-enhanced electron source. In the first part, a post-fabrication method, termed Self-limited Self Perfection by Liquefaction (SP-SPEL), is studied. SP-SPEL has experimentally demonstrated to reduce the trench width with precise control down to 20 nm from original 90 nm width, - 450% reduction. In addition, SP-SPEL increases the trench width uniformity and reduces the low-frequency line edge roughness. Second, a tri-layer method is studied to offer large area, efficient lift-off of ultra-thin (sub-40 nm) and ultra-fine (sub-20 nm) nanostructures. Using this method, a nanoimprint mold is fabricated. Third, tribo-electronics in NIL has been studied. It has been shown that tribo-charge can not only skew the AFM measurement by over 400%, but also largely increase the mold-substrate separation force. To solve this problem, a new mold structure is firstly proposed by Professor Stephen Y Chou and has demonstrated to reduce the separation force by over 8 fold. In the second part, a plasmonic-enhanced nanostructured electron source is studied, for both semiconducting and metallic photoemissive materials. For the semiconducting photocathode, a vertical cavity structure, comprising a top sub-wavelength mesh, ultra-thin (~ 40 nm) semiconducting materials in the middle and metallic back-plane, has demonstrated a 30 fold enhancement in photoelectron emission over a planar thin film. In addition, for the metallic photocathode, a 3D nanocavity, termed "Disk coupled Dots-on-Pillar Antenna

  10. Mask cost of ownership for advanced lithography

    NASA Astrophysics Data System (ADS)

    Muzio, Edward G.; Seidel, Philip K.

    2000-07-01

    As technology advances, becoming more difficult and more expensive, the cost of ownership (CoO) metric becomes increasingly important in evaluating technical strategies. The International SEMATECH CoC analysis has steadily gained visibility over the past year, as it attempts to level the playing field between technology choices, and create a fair relative comparison. In order to predict mask cots for advanced lithography, mask process flows are modeled using bets-known processing strategies, equipment cost, and yields. Using a newly revised yield mode, and updated mask manufacture flows, representative mask flows can be built. These flows are then used to calculate mask costs for advanced lithography down to the 50 nm node. It is never the goal of this type of work to provide absolute cost estimates for business planning purposes. However, the combination of a quantifiable yield model with a clearly defined set of mask processing flows and a cost model based upon them serves as an excellent starting point for cost driver analysis and process flow discussion.

  11. 75 FR 44015 - Certain Semiconductor Products Made by Advanced Lithography Techniques and Products Containing...

    Federal Register 2010, 2011, 2012, 2013, 2014

    2010-07-27

    ... COMMISSION Certain Semiconductor Products Made by Advanced Lithography Techniques and Products Containing... importation of certain semiconductor products made by advanced lithography techniques and products containing... certain semiconductor products made by advanced lithography techniques or products containing same...

  12. Advanced lithography parameters extraction by using scatterometry system: part II

    NASA Astrophysics Data System (ADS)

    Zhou, Wenzhan; Hsieh, Michael; Koh, Huipeng; Zhou, Meisheng

    2008-03-01

    As the advanced IC device process shrinks to below sub-micron dimensions (65nm, 45 nm and beyond), the overall CD error budget becomes more and more challenging. The impact of lithography process parameters other than exposure energy and defocus on final CD results cannot be ignored any more. In this paper we continue the development of the advanced lithography parameters model which we presented last year. This year we achieved to decouple 4 lithography parameters: exposure, focus, PEB temperature and laser bandwidth (or z-blur). To improve the accuracy and precision of the model, new scatterometry marks are designed to reduce the pitch dependent accuracy impact of sidewall angle and photoresist height for scatterometry metrology. The concept of this kind of scatterometry mark design is from T.A. Brunner's paper "Process Monitor Gating" [SPIE Vol. 6518, 2007]. With this concept, new scatterometry marks are designed to increase the accuracy of scatterometry measurement without sacrificing the process sensitivity and thus improve the model prediction accuracy.

  13. Sub-100-nm trackwidth development by e-beam lithography for advanced magnetic recording heads

    NASA Astrophysics Data System (ADS)

    Chang, Jei-Wei; Chen, Chao-Peng

    2006-03-01

    Although semiconductor industry ramps the products with 90 nm much quicker than anticipated [1], magnetic recording head manufacturers still have difficulties in producing sub-100 nm read/write trackwidth. Patterning for high-aspectratio writer requires much higher depth of focus (DOF) than most advanced optical lithography, including immersion technique developed recently [2]. Self-aligning reader with its stabilized bias requires a bi-layer lift-off structure where the underlayer is narrower than the top image layer. As the reader's trackwidth is below 100nm, the underlayer becomes very difficult to control. Among available approaches, e-beam lithography remains the most promising one to overcome the challenge of progressive miniaturization. In this communication, the authors discussed several approaches using ebeam lithography to achieve sub-100 nm read/write trackwidth. Our studies indicated the suspended resist bridge design can not only widen the process window for lift-off process but also makes 65 nm trackwidth feasible to manufacture. Necked dog-bone structure seems to be the best design in this application due to less proximity effects from adjacent structures and minimum blockages for ion beam etching. The trackwidth smaller than 65 nm can be fabricated via the combination of e-beam lithography with auxiliary slimming and/or trimming. However, deposit overspray through undercut becomes dominated in such a small dimension. To minimize the overspray, the effects of underlayer thickness need to be further studied.

  14. Advanced statistical process control: controlling sub-0.18-μm lithography and other processes

    NASA Astrophysics Data System (ADS)

    Zeidler, Amit; Veenstra, Klaas-Jelle; Zavecz, Terrence E.

    2001-08-01

    Feed-forward, as a method to control the Lithography process for Critical Dimensions and Overlay, is well known in the semiconductors industry. However, the control provided by simple averaging feed-forward methodologies is not sufficient to support the complexity of a sub-0.18micrometers lithography process. Also, simple feed-forward techniques are not applicable for logics and ASIC production due to many different products, lithography chemistry combinations and the short memory of the averaging method. In the semiconductors industry, feed-forward control applications are generally called APC, Advanced Process Control applications. Today, there are as many APC methods as the number of engineers involved. To meet the stringent requirements of 0.18 micrometers production, we selected a method that is described in SPIE 3998-48 (March 2000) by Terrence Zavecz and Rene Blanquies from Yield Dynamics Inc. This method is called PPC, Predictive Process Control, and employs a methodology of collecting measurement results and the modeled bias attributes of expose tools, reticles and the incoming process in a signatures database. With PPC, before each lot exposure, the signatures of the lithography tool, the reticle and the incoming process are used to predict the setup of the lot process and the expected lot results. Benefits derived from such an implementation are very clear; there is no limitation of the number of products or lithography-chemistry combinations and the technique avoids the short memory of conventional APC techniques. ... and what's next? (Rob Morton, Philips assignee to International Sematech). The next part of the paper will try to answer this question. Observing that CMP and metal deposition significantly influence CD's and overlay results, and even Contact Etch can have a significant influence on Metal 5 overlay, we developed a more general PPC for lithography. Starting with the existing lithography PPC applications database, the authors extended the

  15. Implementation and benefits of advanced process control for lithography CD and overlay

    NASA Astrophysics Data System (ADS)

    Zavyalova, Lena; Fu, Chong-Cheng; Seligman, Gary S.; Tapp, Perry A.; Pol, Victor

    2003-05-01

    Due to the rapidly reduced imaging process windows and increasingly stingent device overlay requirements, sub-130 nm lithography processes are more severely impacted than ever by systamic fault. Limits on critical dimensions (CD) and overlay capability further challenge the operational effectiveness of a mix-and-match environment using multiple lithography tools, as such mode additionally consumes the available error budgets. Therefore, a focus on advanced process control (APC) methodologies is key to gaining control in the lithographic modules for critical device levels, which in turn translates to accelerated yield learning, achieving time-to-market lead, and ultimately a higher return on investment. This paper describes the implementation and unique challenges of a closed-loop CD and overlay control solution in high voume manufacturing of leading edge devices. A particular emphasis has been placed on developing a flexible APC application capable of managing a wide range of control aspects such as process and tool drifts, single and multiple lot excursions, referential overlay control, 'special lot' handling, advanced model hierarchy, and automatic model seeding. Specific integration cases, including the multiple-reticle complementary phase shift lithography process, are discussed. A continuous improvement in the overlay and CD Cpk performance as well as the rework rate has been observed through the implementation of this system, and the results are studied.

  16. Application of optical CD metrology for alternative lithography

    NASA Astrophysics Data System (ADS)

    Asano, Masafumi; Kawamoto, Akiko; Matsuki, Kazuto; Godny, Stephane; Lin, Tingsheng; Wakamoto, Koichi

    2013-04-01

    Directed self-assembly (DSA) and nanoimprint lithography (NIL) have been widely developed for low-cost nanoscale patterning. Although they are currently regarded as "alternative lithography," some papers show their potential to be candidates for next-generation lithography (NGL). To actualize the potential, the contribution of metrology engineers is necessary. Since the characteristics of the lithography techniques are different from those of conventional lithography, new metrology schemes correlated with each characteristic are required. In DSA of block copolymer (BCP), a guide is needed to control the direction and position of BCP. Therefore, it is necessary to monitor the relationship between the guide and the BCP pattern. Since the depth of guide or the coating thickness variation of BCP over guide influences the behavior of phase separation of BCP, 3D metrology becomes increasingly important. In NIL, residual resist thickness (RLT) underneath the pattern should be measured because its variation affects the CD variation of transferred pattern. 3D metrology is also important in NIL. Optical critical dimension (OCD) metrology will be a powerful tool for 3D metrology. In this work, some applications of OCD for alternative lithography have been studied. For DSA, we have tried to simultaneously monitor the guide and BCP pattern in a DSA-based contact hole shrinking process. Sufficient measurement accuracy for CD and shapes for guide and BCP patterns was achievable. For NIL, sufficient sensitivity to RLT measurement was obtained.

  17. Mask characterization for CDU budget breakdown in advanced EUV lithography

    NASA Astrophysics Data System (ADS)

    Nikolsky, Peter; Strolenberg, Chris; Nielsen, Rasmus; Nooitgedacht, Tjitte; Davydova, Natalia; Yang, Greg; Lee, Shawn; Park, Chang-Min; Kim, Insung; Yeo, Jeong-Ho

    2012-11-01

    As the ITRS Critical Dimension Uniformity (CDU) specification shrinks, semiconductor companies need to maintain a high yield of good wafers per day and a high performance (and hence market value) of finished products. This cannot be achieved without continuous analysis and improvement of on-product CDU as one of the main drivers for process control and optimization with better understanding of main contributors from the litho cluster: mask, process, metrology and scanner. In this paper we will demonstrate a study of mask CDU characterization and its impact on CDU Budget Breakdown (CDU BB) performed for an advanced EUV lithography with 1D and 2D feature cases. We will show that this CDU contributor is one of the main differentiators between well-known ArFi and new EUV CDU budgeting principles. We found that reticle contribution to intrafield CDU should be characterized in a specific way: mask absorber thickness fingerprints play a role comparable with reticle CDU in the total reticle part of the CDU budget. Wafer CD fingerprints, introduced by this contributor, may or may not compensate variations of mask CD's and hence influence on total mask impact on intrafield CDU at the wafer level. This will be shown on 1D and 2D feature examples in this paper. Also mask stack reflectivity variations should be taken into account: these fingerprints have visible impact on intrafield CDs at the wafer level and should be considered as another contributor to the reticle part of EUV CDU budget. We observed also MEEF-through-field fingerprints in the studied EUV cases. Variations of MEEF may also play a role for the total intrafield CDU and may be taken into account for EUV Lithography. We characterized MEEF-through-field for the reviewed features, the results to be discussed in our paper, but further analysis of this phenomenon is required. This comprehensive approach to characterization of the mask part of EUV CDU characterization delivers an accurate and integral CDU Budget

  18. Total lithography system based on a new application software platform enabling smart scanner management

    NASA Astrophysics Data System (ADS)

    Kono, Hirotaka; Masaki, Kazuo; Matsuyama, Tomoyuki; Wakamoto, Shinji; Park, Seemoon; Sugihara, Taro; Shibazaki, Yuichi

    2015-03-01

    Along with device shrinkage, higher accuracy will continuously be required from photo-lithography tools in order to enhance on-product yield. In order to achieve higher yield, the advanced photo-lithography tools must be equipped with sophisticated tuning knobs on the tool and with software that is flexible enough to be applied per layer. This means photo-lithography tools must be capable of handling many types of sub-recipes and parameters simultaneously. To enable managing such a large amount of data easily and to setup lithography tools smoothly, we have developed a total lithography system called Litho Turnkey Solution based on a new software application platform, which we call Plug and Play Manager (PPM). PPM has its own graphical user interface, which enables total management of various data. Here various data means recipes, sub-recipes, tuning-parameters, measurement results, and so on. Through PPM, parameter making by intelligent applications such as CDU/Overlay tuning tools can easily be implemented. In addition, PPM is also linked to metrology tools and the customer's host computer, which enables data flow automation. Based on measurement data received from the metrology tools, PPM calculates correction parameters and sends them to the scanners automatically. This scheme can make calibration feedback loops possible. It should be noted that the abovementioned functions are running on the same platform through a user-friendly interface. This leads to smart scanner management and usability improvement. In this paper, we will demonstrate the latest development status of Nikon's total lithography solution based on PPM; describe details of each application; and provide supporting data for the accuracy and usability of the system. Keywords: exposure

  19. Applications of nanoimprint lithography/hot embossing: a review

    NASA Astrophysics Data System (ADS)

    Chen, Yifang

    2015-11-01

    This review concentrates on the applications of nanoimprint lithography (NIL) and hot embossing for the fabrications of nanolectronic devices, nanophotonic metamaterials and other nanostructures. Technical challenges and solutions in NIL such as nanofabrication of templates, removal of residual resist, pattern displacement in thermal NIL arising from thermal expansion are first discussed. In the nanofabrication of templates, dry etch in plasma for the formation of multi-step structures and ultra-sharp tip arrays in silicon, nanophotonic chiral structures with high aspect ratio in SiC are demonstrated. A bilayer technique for nondestructive removal of residual resist in thermal NIL is described. This process is successfully applied for the fabrication of T-shape gates and functional high electron mobility transistors. However, pattern displacement intrinsically existing in thermal NIL/hot embossing owing to different thermal expansions in the template and substrate, respectively, limits its further development and scale-up. Low temperature even room temperature NIL (RTNIL) was then proposed on HSQ, trying to eliminate the pattern distortion by avoiding a thermal loop in the imprint. But, considerable pressure needed in RTNIL turned the major attentions to the development of UV-curing NIL in UV-curable monomers at low temperature. A big variety of applications by low-temperature UV-curing NIL in SU-8 are described, including high-aspect-ratio phase gratings, tagging technology by nanobarcode for DNA sequencing, nanofluidic channels, nanophotonic metamaterials and biosensors. Hot embossing, as a parallel technique to NIL, was also developed, and its applications on ferroelectric polymers as well as metals are reviewed. Therefore, it is necessary to emphasize that this review is mainly attempted to review the applications of NIL/embossing instead of NIL technique advances.

  20. Metallic nanodot arrays by stencil lithography for plasmonic biosensing applications.

    PubMed

    Vazquez-Mena, Oscar; Sannomiya, Takumi; Villanueva, Luis G; Voros, Janos; Brugger, Juergen

    2011-02-22

    The fabrication of gold nanodots by stencil lithography and its application for optical biosensing based on localized surface plasmon resonance are presented. Arrays of 50-200 nm wide nanodots with different spacing of 50-300 nm are fabricated without any resist, etching, or lift-off process. The dimensions and morphology of the nanodots were characterized by scanning electron and atomic force microscopy. The fabricated nanodots showed localized surface plasmon resonance in their extinction spectra in the visible range. The resonance wavelength depends on the periodicity and dimensions of the nanodots. Bulk refractive index measurements and model biosensing of streptavidin were successfully performed based on the plasmon resonance shift induced by local refractive index change when biomolecules are adsorbed on the nanodots. These results demonstrate the potential of stencil lithography for the realization of plasmon-based biosensing devices.

  1. Option of resolution enhancement technology in advanced lithography

    NASA Astrophysics Data System (ADS)

    Li, Yanqui; Zhou, Yuan

    2007-12-01

    Hyper-numerical aperture ArF scanner has being designed to meet the needs of 45nm node. Resolution enhancement technology, such as phase shift mask, off-axis illumination, and innovation processing technology must be employed in hyper-numerical aperture ArF lithography. However the cross talk of phase shift mask, off axis illumination, polarization effect, and resist stack impacts lithography performance significantly. Option of resolution enhancement technology is presented in conjunction with optimal dual-layers bottom anti-refactive coating and polarized illumination by our program and Prolith 9.0. Multi options of resolution enhancement technology are obtained to maintain a small CD, good CD uniformity (CDU), reasonable process window (PW) and fidelity of resist profile.

  2. 3D nanostructures fabricated by advanced stencil lithography

    NASA Astrophysics Data System (ADS)

    Yesilkoy, F.; Flauraud, V.; Rüegg, M.; Kim, B. J.; Brugger, J.

    2016-02-01

    This letter reports on a novel fabrication method for 3D metal nanostructures using high-throughput nanostencil lithography. Aperture clogging, which occurs on the stencil membranes during physical vapor deposition, is leveraged to create complex topographies on the nanoscale. The precision of the 3D nanofabrication method is studied in terms of geometric parameters and material types. The versatility of the technique is demonstrated by various symmetric and chiral patterns made of Al and Au.

  3. 3D nanostructures fabricated by advanced stencil lithography.

    PubMed

    Yesilkoy, F; Flauraud, V; Rüegg, M; Kim, B J; Brugger, J

    2016-03-07

    This letter reports on a novel fabrication method for 3D metal nanostructures using high-throughput nanostencil lithography. Aperture clogging, which occurs on the stencil membranes during physical vapor deposition, is leveraged to create complex topographies on the nanoscale. The precision of the 3D nanofabrication method is studied in terms of geometric parameters and material types. The versatility of the technique is demonstrated by various symmetric and chiral patterns made of Al and Au.

  4. Mask manufacturing of advanced technology designs using multi-beam lithography (part 2)

    NASA Astrophysics Data System (ADS)

    Green, Michael; Ham, Young; Dillon, Brian; Kasprowicz, Bryan; Hur, Ik Boum; Park, Joong Hee; Choi, Yohan; McMurran, Jeff; Kamberian, Henry; Chalom, Daniel; Klikovits, Jan; Jurkovic, Michal; Hudek, Peter

    2016-09-01

    As optical lithography is extended into 10nm and below nodes, advanced designs are becoming a key challenge for mask manufacturers. Techniques including advanced optical proximity correction (OPC) and Inverse Lithography Technology (ILT) result in structures that pose a range of issues across the mask manufacturing process. Among the new challenges are continued shrinking sub-resolution assist features (SRAFs), curvilinear SRAFs, and other complex mask geometries that are counter-intuitive relative to the desired wafer pattern. Considerable capability improvements over current mask making methods are necessary to meet the new requirements particularly regarding minimum feature resolution and pattern fidelity. Advanced processes using the IMS Multi-beam Mask Writer (MBMW) are feasible solutions to these coming challenges. In this paper, Part 2 of our study, we further characterize an MBMW process for 10nm and below logic node mask manufacturing including advanced pattern analysis and write time demonstration.

  5. Mask manufacturing of advanced technology designs using multi-beam lithography (Part 1)

    NASA Astrophysics Data System (ADS)

    Green, Michael; Ham, Young; Dillon, Brian; Kasprowicz, Bryan; Hur, Ik Boum; Park, Joong Hee; Choi, Yohan; McMurran, Jeff; Kamberian, Henry; Chalom, Daniel; Klikovits, Jan; Jurkovic, Michal; Hudek, Peter

    2016-10-01

    As optical lithography is extended into 10nm and below nodes, advanced designs are becoming a key challenge for mask manufacturers. Techniques including advanced Optical Proximity Correction (OPC) and Inverse Lithography Technology (ILT) result in structures that pose a range of issues across the mask manufacturing process. Among the new challenges are continued shrinking Sub-Resolution Assist Features (SRAFs), curvilinear SRAFs, and other complex mask geometries that are counter-intuitive relative to the desired wafer pattern. Considerable capability improvements over current mask making methods are necessary to meet the new requirements particularly regarding minimum feature resolution and pattern fidelity. Advanced processes using the IMS Multi-beam Mask Writer (MBMW) are feasible solutions to these coming challenges. In this paper, we study one such process, characterizing mask manufacturing capability of 10nm and below structures with particular focus on minimum resolution and pattern fidelity.

  6. Lithography with infrared illumination alignment for advanced BiCMOS backside processing

    NASA Astrophysics Data System (ADS)

    Kulse, P.; Schulz, K.; Behrendt, U.; Wietstruck, M.; Kaynak, M.; Marschmeyer, S.; Tillack, B.

    2014-10-01

    Driven by new applications such as BiCMOS embedded RF-MEMS, high-Q passives, Si-based microfluidics for bio sensing and InP-Si BiCMOS heterointegration [1-4], accurate alignment between back and front side is highly desired. In this paper, we present an advanced back to front side alignment technique and implementation of it into the back side processing module of IHP's 0.25/0.13 μm high performance SiGe:C BiCMOS technology. Using the Nikon i-line Stepper NSR-SF150, a new infrared alignment system has been introduced. The developed technique enables a high resolution and accurate lithography on the back side of the BiCMOS-processed Si wafers for additional backside processing, such as backside routing metallization. In comparison to previous work [5] with overlay values of 500 nm and the requirement of two-step lithography, the new approach provides significant improvement in the overlay accuracy with overlay values of 200 nm and a significant increase of the fabrication throughput by eliminating the need of the two-step lithography. The new non-contact alignment procedure allows a direct back to front side alignment using any front side alignment mark (Fig. 2), which generated a signal by reflecting the IR light beam. Followed by a measurement of the misalignment between both front to back side overlay marks (Fig. 3) using EVG®NT40 automated measurement system, a final lithography process with wafer interfield corrections is applied to obtain a minimum overlay of 200 nm. For the specific application of deep Si etching using Bosch process, the etch profile angle deviation across the wafer (tilting) has to be considered as well. From experimental data, an etch profile angle deviation of 8 μm across the wafer has been measured (Fig. 7). The overlay error caused by tilting was corrected by optimization and adjustment of the stepper offset parameters. All measurements of back to front side misalignment were performed with the EVG®40NT automated measurement system

  7. Nanopatterning by laser interference lithography: applications to optical devices.

    PubMed

    Seo, Jung-Hun; Park, Jung Ho; Kim, Seong-Il; Park, Bang Ju; Ma, Zhenqiang; Choi, Jinnil; Ju, Byeong-Kwon

    2014-02-01

    A systematic review, covering fabrication of nanoscale patterns by laser interference lithography (LIL) and their applications for optical devices is provided. LIL is a patterning method. It is a simple, quick process over a large area without using a mask. LIL is a powerful technique for the definition of large-area, nanometer-scale, periodically patterned structures. Patterns are recorded in a light-sensitive medium that responds nonlinearly to the intensity distribution associated with the interference of two or more coherent beams of light. The photoresist patterns produced with LIL are the platform for further fabrication of nanostructures and growth of functional materials used as the building blocks for devices. Demonstration of optical and photonic devices by LIL is reviewed such as directed nanophotonics and surface plasmon resonance (SPR) or large area membrane reflectors and anti-reflectors. Perspective on future directions for LIL and emerging applications in other fields are presented.

  8. X-ray lithography for micro- and nano-fabrication at ELETTRA for interdisciplinary applications

    NASA Astrophysics Data System (ADS)

    Di Fabrizio, E.; Fillipo, R.; Cabrini, S.; Kumar, R.; Perennes, F.; Altissimo, M.; Businaro, L.; Cojac, D.; Vaccari, L.; Prasciolu, M.; Candeloro, P.

    2004-08-01

    ELETTRA (http://www.elettra.trieste.it/index.html) is a third generation synchrotron radiation source facility operating at Trieste, Italy, and hosts a wide range of research activities in advanced materials analysis and processing, biology and nano-science at several various beam lines. The energy spectrum of ELETTRA allows x-ray nano-lithography using soft (1.5 keV) and hard x-ray (10 keV) wavelengths. The Laboratory for Interdisciplinary Lithography (LIILIT) was established in 1998 as part of an Italian national initiative on micro- and nano-technology project of INFM and is funded and supported by the Italian National Research Council (CNR), INFM and ELETTRA. LILIT had developed two dedicated lithographic beam lines for soft (1.5 keV) and hard x-ray (10 keV) for micro- and nano-fabrication activities for their applications in engineering, science and bio-medical applications. In this paper, we present a summary of our research activities in micro- and nano-fabrication involving x-ray nanolithography at LILIT's soft and hard x-ray beam lines.

  9. Fabrication of synthetic diffractive elements using advanced matrix laser lithography

    NASA Astrophysics Data System (ADS)

    Škereň, M.; Svoboda, J.; Květoň, M.; Fiala, P.

    2013-02-01

    In this paper we present a matrix laser writing device based on a demagnified projection of a micro-structure from a computer driven spatial light modulator. The device is capable of writing completely aperiodic micro-structures with resolution higher than 200 000 DPI. An optical system is combined with ultra high precision piezoelectric stages with an elementary step ~ 4 nm. The device operates in a normal environment, which significantly decreases the costs compared to competitive technologies. Simultaneously, large areas can be exposed up to 100 cm2. The capabilities of the constructed device will be demonstrated on particular elements fabricated for real applications. The optical document security is the first interesting field, where the synthetic image holograms are often combined with sophisticated aperiodic micro-structures. The proposed technology can easily write simple micro-gratings creating the color and kinetic visual effects, but also the diffractive cryptograms, waveguide couplers, and other structures recently used in the field of optical security. A general beam shaping elements and special photonic micro-structures are another important applications which will be discussed in this paper.

  10. The study of lithography conditions to use advanced resist performance properly

    NASA Astrophysics Data System (ADS)

    Yang, Zhengkai; Wang, Wuping; Chen, Quan; Aoyama, Hajime; Takemasa, Kengo; Sei, Toshihiko; Miyazawa, Tami; Matsuyama, Tomoyuki; Shao, Chun

    2015-03-01

    Correlation of resist modeling of printed features with lithographic data is a necessary part of developing new lithographic processes. Recently, we have found a case in which the most advanced resist types sometimes show better behavior than expectations from optical simulation in terms of dose latitude, MEEF (mask error enhancement factor), and even CD variation through different pitches. This superior resist performance may allow greater margin for error in each component, such as mask, scanner, and metrology in very low-k1 lithography. On the other hand, since the resist pattern CD for the most advanced resist is very much different from the prediction of optical simulation, it is a challenge to build OPC models using the exposure result with the resist. In order to solve this issue, we have tried to use several litho parameters to reduce the gap between optical simulation and resist CDs for OPC modeling. In this paper we discuss the effect of the parameters to reduce the gap between optical model and actual resist behavior with keeping superior performance as much as possible. The method we mention may be a key to use the most advanced resist in near future. As a result the life of ArF immersion lithography in the critical layer would be extended than we expect today.

  11. Advanced 0.3-NA EUV lithography capabilities at the ALS

    SciTech Connect

    Naulleau, Patrick; Anderson, Erik; Dean, Kim; Denham, Paul; Goldberg, Kenneth A.; Hoef, Brian; Jackson, Keith

    2005-07-07

    For volume nanoelectronics production using Extreme ultraviolet (EUV) lithography [1] to become a reality around the year 2011, advanced EUV research tools are required today. Microfield exposure tools have played a vital role in the early development of EUV lithography [2-4] concentrating on numerical apertures (NA) of 0.2 and smaller. Expected to enter production at the 32-nm node with NAs of 0.25, EUV can no longer rely on these early research tools to provide relevant learning. To overcome this problem, a new generation of microfield exposure tools, operating at an NA of 0.3 have been developed [5-8]. Like their predecessors, these tools trade off field size and speed for greatly reduced complexity. One of these tools is implemented at Lawrence Berkeley National Laboratory's Advanced Light Source synchrotron radiation facility. This tool gets around the problem of the intrinsically high coherence of the synchrotron source [9,10] by using an active illuminator scheme [11]. Here we describe recent printing results obtained from the Berkeley EUV exposure tool. Limited by the availability of ultra-high resolution chemically amplified resists, present resolution limits are approximately 32 nm for equal lines and spaces and 27 nm for semi-isolated lines.

  12. Nanoimprint lithography for nanodevice fabrication

    NASA Astrophysics Data System (ADS)

    Barcelo, Steven; Li, Zhiyong

    2016-09-01

    Nanoimprint lithography (NIL) is a compelling technique for low cost nanoscale device fabrication. The precise and repeatable replication of nanoscale patterns from a single high resolution patterning step makes the NIL technique much more versatile than other expensive techniques such as e-beam or even helium ion beam lithography. Furthermore, the use of mechanical deformation during the NIL process enables grayscale lithography with only a single patterning step, not achievable with any other conventional lithography techniques. These strengths enable the fabrication of unique nanoscale devices by NIL for a variety of applications including optics, plasmonics and even biotechnology. Recent advances in throughput and yield in NIL processes demonstrate the potential of being adopted for mainstream semiconductor device fabrication as well.

  13. Nanoimprint lithography for nanodevice fabrication.

    PubMed

    Barcelo, Steven; Li, Zhiyong

    2016-01-01

    Nanoimprint lithography (NIL) is a compelling technique for low cost nanoscale device fabrication. The precise and repeatable replication of nanoscale patterns from a single high resolution patterning step makes the NIL technique much more versatile than other expensive techniques such as e-beam or even helium ion beam lithography. Furthermore, the use of mechanical deformation during the NIL process enables grayscale lithography with only a single patterning step, not achievable with any other conventional lithography techniques. These strengths enable the fabrication of unique nanoscale devices by NIL for a variety of applications including optics, plasmonics and even biotechnology. Recent advances in throughput and yield in NIL processes demonstrate the potential of being adopted for mainstream semiconductor device fabrication as well.

  14. Advanced in-situ electron-beam lithography for deterministic nanophotonic device processing

    SciTech Connect

    Kaganskiy, Arsenty; Gschrey, Manuel; Schlehahn, Alexander; Schmidt, Ronny; Schulze, Jan-Hindrik; Heindel, Tobias; Rodt, Sven Reitzenstein, Stephan; Strittmatter, André

    2015-07-15

    We report on an advanced in-situ electron-beam lithography technique based on high-resolution cathodoluminescence (CL) spectroscopy at low temperatures. The technique has been developed for the deterministic fabrication and quantitative evaluation of nanophotonic structures. It is of particular interest for the realization and optimization of non-classical light sources which require the pre-selection of single quantum dots (QDs) with very specific emission features. The two-step electron-beam lithography process comprises (a) the detailed optical study and selection of target QDs by means of CL-spectroscopy and (b) the precise retrieval of the locations and integration of target QDs into lithographically defined nanostructures. Our technology platform allows for a detailed pre-process determination of important optical and quantum optical properties of the QDs, such as the emission energies of excitonic complexes, the excitonic fine-structure splitting, the carrier dynamics, and the quantum nature of emission. In addition, it enables a direct and precise comparison of the optical properties of a single QD before and after integration which is very beneficial for the quantitative evaluation of cavity-enhanced quantum devices.

  15. Advanced in-situ electron-beam lithography for deterministic nanophotonic device processing

    NASA Astrophysics Data System (ADS)

    Kaganskiy, Arsenty; Gschrey, Manuel; Schlehahn, Alexander; Schmidt, Ronny; Schulze, Jan-Hindrik; Heindel, Tobias; Strittmatter, André; Rodt, Sven; Reitzenstein, Stephan

    2015-07-01

    We report on an advanced in-situ electron-beam lithography technique based on high-resolution cathodoluminescence (CL) spectroscopy at low temperatures. The technique has been developed for the deterministic fabrication and quantitative evaluation of nanophotonic structures. It is of particular interest for the realization and optimization of non-classical light sources which require the pre-selection of single quantum dots (QDs) with very specific emission features. The two-step electron-beam lithography process comprises (a) the detailed optical study and selection of target QDs by means of CL-spectroscopy and (b) the precise retrieval of the locations and integration of target QDs into lithographically defined nanostructures. Our technology platform allows for a detailed pre-process determination of important optical and quantum optical properties of the QDs, such as the emission energies of excitonic complexes, the excitonic fine-structure splitting, the carrier dynamics, and the quantum nature of emission. In addition, it enables a direct and precise comparison of the optical properties of a single QD before and after integration which is very beneficial for the quantitative evaluation of cavity-enhanced quantum devices.

  16. 4-Nitrobenzene Grafted in Porous Silicon: Application to Optical Lithography.

    PubMed

    Tiddia, Mariavitalia; Mula, Guido; Sechi, Elisa; Vacca, Annalisa; Cara, Eleonora; De Leo, Natascia; Fretto, Matteo; Boarino, Luca

    2016-12-01

    In this work, we report a method to process porous silicon to improve its chemical resistance to alkaline solution attacks based on the functionalization of the pore surface by the electrochemical reduction of 4-nitrobenzendiazonium salt. This method provides porous silicon with strong resistance to the etching solutions used in optical lithography and allows the fabrication of tailored metallic contacts on its surface. The samples were studied by chemical, electrochemical, and morphological methods. We demonstrate that the grafted samples show a resistance to harsh alkaline solution more than three orders of magnitude larger than that of pristine porous silicon, being mostly unmodified after about 40 min. The samples maintained open pores after the grafting, making them suitable for further treatments like filling by polymers. Optical lithography was performed on the functionalized samples, and electrochemical characterization results are shown.

  17. Metrology for Grayscale Lithography

    SciTech Connect

    Murali, Raghunath

    2007-09-26

    Three dimensional microstructures find applications in diffractive optical elements, photonic elements, etc. and can be efficiently fabricated by grayscale lithography. Good process control is important for achieving the desired structures. Metrology methods for grayscale lithography are discussed. Process optimization for grayscale e-beam lithography is explored and various process parameters that affect the grayscale process are discussed.

  18. Electron-beam lithography for micro and nano-optical applications

    NASA Technical Reports Server (NTRS)

    Wilson, Daniel W.; Muller, Richard E.; Echternach, Pierre M.

    2005-01-01

    Direct-write electron-beam lithography has proven to be a powerful technique for fabricating a variety of micro- and nano-optical devices. Binary E-beam lithography is the workhorse technique for fabricating optical devices that require complicated precision nano-scale features. We describe a bi-layer resist system and virtual-mark height measurement for improving the reliability of fabricating binary patterns. Analog E-beam lithography is a newer technique that has found significant application in the fabrication of diffractive optical elements. We describe our techniques for fabricating analog surface-relief profiles in E-beam resist, including some discussion regarding overcoming the problems of resist heating and charging. We also describe a multiple-field-size exposure scheme for suppression of field-stitch induced ghost diffraction orders produced by blazed diffraction gratings on non-flat substrates.

  19. Multi-shaped beam proof of lithography

    NASA Astrophysics Data System (ADS)

    Slodowski, Matthias; Doering, Hans-Joachim; Dorl, Wolfgang; Stolberg, Ines A.

    2010-03-01

    In this paper a full package high throughput multi electron-beam approach, called Multi Shaped Beam (MSB), for applications in mask making as well as direct write will be presented including complex proof-of-lithography results. The basic concept enables a significant exposure shot count reduction for advanced patterns compared to standard Variable Shaped Beam (VSB) systems and allows full pattern flexibility by concurrently using MSB, VSB and Cell Projection (CP). Proof of lithography results will be presented, which have been performed using a fully operational electron-beam lithography system including data path and substrate scanning by x/y-stage movement.

  20. Mask characterization for critical dimension uniformity budget breakdown in advanced extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Nikolsky, Peter; Strolenberg, Chris; Nielsen, Rasmus; Nooitgedacht, Tjitte; Davydova, Natalia; Yang, Greg; Lee, Shawn; Park, Chang-Min; Kim, Insung; Yeo, Jeong-Ho

    2013-04-01

    As the International Technology Roadmap for Semiconductors critical dimension uniformity (CDU) specification shrinks, semiconductor companies need to maintain a high yield of good wafers per day and high performance (and hence market value) of finished products. This cannot be achieved without continuous analysis and improvement of on-product CDU as one of the main drivers for process control and optimization with better understanding of main contributors from the litho cluster: mask, process, metrology and scanner. We will demonstrate a study of mask CDU characterization and its impact on CDU Budget Breakdown (CDU BB) performed for advanced extreme ultraviolet (EUV) lithography with 1D (dense lines) and 2D (dense contacts) feature cases. We will show that this CDU contributor is one of the main differentiators between well-known ArFi and new EUV CDU budgeting principles. We found that reticle contribution to intrafield CDU should be characterized in a specific way: mask absorber thickness fingerprints play a role comparable with reticle CDU in the total reticle part of the CDU budget. Wafer CD fingerprints, introduced by this contributor, may or may not compensate variations of mask CDs and hence influence on total mask impact on intrafield CDU at the wafer level. This will be shown on 1D and 2D feature examples. Mask stack reflectivity variations should also be taken into account: these fingerprints have visible impact on intrafield CDs at the wafer level and should be considered as another contributor to the reticle part of EUV CDU budget. We also observed mask error enhancement factor (MEEF) through field fingerprints in the studied EUV cases. Variations of MEEF may play a role towards the total intrafield CDU and may need to be taken into account for EUV lithography. We characterized MEEF-through-field for the reviewed features, with results herein, but further analysis of this phenomenon is required. This comprehensive approach to quantifying the mask part of

  1. Inspection of advanced computational lithography logic reticles using a 193-nm inspection system

    NASA Astrophysics Data System (ADS)

    Yu, Ching-Fang; Lin, Mei-Chun; Lai, Mei-Tsu; Hsu, Luke T. H.; Chin, Angus; Lee, S. C.; Yen, Anthony; Wang, Jim; Chen, Ellison; Wu, David; Broadbent, William H.; Huang, William; Zhu, Zinggang

    2010-09-01

    We report inspection results of early 22-nm logic reticles designed with both conventional and computational lithography methods. Inspection is performed using a state-of-the-art 193-nm reticle inspection system in the reticleplane inspection mode (RPI) where both rule-based sensitivity control (RSC) and a newer modelbased sensitivity control (MSC) method are tested. The evaluation includes defect detection performance using several special test reticles designed with both conventional and computational lithography methods; the reticles contain a variety of programmed critical defects which are measured based on wafer print impact. Also included are inspection results from several full-field product reticles designed with both conventional and computational lithography methods to determine if low nuisance-defect counts can be achieved. These early reticles are largely single-die and all inspections are performed in the die-to-database inspection mode only.

  2. Coaxial Lithography

    NASA Astrophysics Data System (ADS)

    Ozel, Tuncay

    demonstrate the possibilities afforded by COAL. Chapter 5 addresses the use of COAL for the synthesis of solution dispersible metal nanorings and nanotubes with exceptional architectural tailorability of inner diameter, outer diameter, and length leading to precise spectral control over the resulting plasmonic fields ranging from visible to the near-IR. Chapter 6 is an outlook on templated electrochemical synthesis using coaxial lithography and highlights a few promising applications from nanoparticle assembly to light-matter interactions.

  3. The Exicor DUV birefringence measurement system and its application to measuring lithography-grade CaF2 lens blanks

    NASA Astrophysics Data System (ADS)

    Wang, Baoliang; Griffiths, C. O.; Rockwell, Rick R.; List, Jennifer; Mark, Doug

    2003-11-01

    Optical lithography continues its transition to shorter wavelengths to support the semiconductor industry"s production of faster microchips to meet evolving market demands. The next step for optical lithography is likely to use the F2 excimer laser at 157.63 nm (157 nm,according to the industry" s naming convention).At 157 nm, among the limited number of fluoride crystals with acceptable optical properties calcium fluoride is the only practical lens material for step and scan systems due to its readiness for mass production. Since the discovery of intrinsic birefringence in CaF2 at deep ultraviolet (DUV)wavelengths,the optical lithography industry has developed a critical interest in measuring birefringence at 157 nm. In response to this need, we have developed a DUV birefringence measurement system. In this article,we describe the working principle, system construction, technical performance and selected applications for measuring lithography grade calcium fluoride lens blanks at DUV wavelengths.

  4. Applications of laser lithography on oxide film to titanium micromachining

    NASA Astrophysics Data System (ADS)

    Chauvy, P.-F.; Hoffmann, P.; Landolt, D.

    2003-03-01

    Due to its good biocompatibility titanium is widely used for dental and orthopaedics implants and for biomedical microsystems. For these applications one needs specific micromachining methods. A new four-step method for electrochemical micromachining of titanium is presented here, which implies anodic oxidation, Excimer laser sensitising irradiation, anodic dissolution, and ultrasonic cleaning. The method is applied to the fabrication of two 3D model structures, surface structuring of a cylinder and machining of a complex two-level architecture. The absence of debris and of a heat affected zone as well as the resulting surface smoothness are the main advantages of the process. Ways to improve the still limited processing speed are discussed with regards to potential applications.

  5. Application of UV depth lithography in micro system technology

    NASA Astrophysics Data System (ADS)

    Büttgenbach, Stephanus; Feldmann, Marco

    2008-01-01

    This letter reports on new types of photo resists allowing UV-light exposure of thick layers. Optimized processes Cthat for the positive resist AZ 9260 and the negative resist Epon SU-8 have been developed enabling the fabrication of high aspect ratio metallic and polymer micro components. The high potential of this technology will be demonstrated on the basis of two examples, a variable reluctance micro motor with compensated attractive force and an optical microphone developed for application in electro-magnetic interference environments.

  6. Magnetic Nanoparticles: Material Engineering and Emerging Applications in Lithography and Biomedicine

    PubMed Central

    Bao, Yuping; Wen, Tianlong; Samia, Anna Cristina S.; Khandhar, Amit; Krishnan, Kannan M.

    2015-01-01

    We present an interdisciplinary overview of material engineering and emerging applications of iron oxide nanoparticles. We discuss material engineering of nanoparticles in the broadest sense, emphasizing size and shape control, large-area self-assembly, composite/hybrid structures, and surface engineering. This is followed by a discussion of several non-traditional, emerging applications of iron oxide nanoparticles, including nanoparticle lithography, magnetic particle imaging, magnetic guided drug delivery, and positive contrast agents for magnetic resonance imaging. We conclude with a succinct discussion of the pharmacokinetics pathways of iron oxide nanoparticles in the human body –– an important and required practical consideration for any in vivo biomedical application, followed by a brief outlook of the field. PMID:26586919

  7. Advanced patterning approaches based on negative-tone development (NTD) process for further extension of 193nm immersion lithography

    NASA Astrophysics Data System (ADS)

    Shirakawa, Michihiro; Inoue, Naoki; Furutani, Hajime; Yamamoto, Kei; Goto, Akiyoshi; Fujita, Mitsuhiro

    2015-03-01

    Two approaches which achieve the further evolution of NTD (Negative Tone Development) process are shown in this article. One is ACCEL (Advanced Chemical Contrast Enhancement Layer) process that can improve the lithography performance and the other is DTD (Dual Tone Development) process that can shrink patterning pitch below the limit of single exposure process. ACCEL is an additionally provided layer which is coated on a surface of NTD resist film before exposure and removed by NTD developer. ACCEL can enhance the acid distribution and dissolution contrast of the NTD resist. In fact, lithography performances such as exposure latitude (EL) and DOF improved dramatically by applying ACCEL compared to the NTD resist without ACCEL. We consider that suppression of excessive acid diffusion and material transfer between the resist layer and the ACCEL layer are the causes of the contrast enhancement. DTD process is one of the simplest pitch shrink method which is achieved by repeating PTD and NTD process. Feasibility study of DTD patterning has been demonstrated so far. However, Exposure latitude margin and CDU performance were not sufficient for applying DTD to HVM. We developed the novel DTD specific resist under a new concept, and 32 nm half pitch (hp) contact hole (CH) pattern was successfully formed with enough margins. DTD line and space (L/S) patterning are also demonstrated and 24 nm hp L/S pattern can be resolved. k1 factors of DTD CH and L/S patterns reach to 0.20 and 0.15, respectively.

  8. Electroplated porous polypyrrole nanostructures patterned by colloidal lithography for drug-delivery applications

    NASA Astrophysics Data System (ADS)

    Pokki, J.; Ergeneman, O.; Sivaraman, K. M.; Özkale, B.; Zeeshan, M. A.; Lühmann, T.; Nelson, B. J.; Pané, S.

    2012-05-01

    Porous nanostructures of polypyrrole (Ppy) were fabricated using colloidal lithography and electrochemical techniques for potential applications in drug delivery. A sequential fabrication method was developed and optimized to maximize the coverage of the Ppy nanostructures and to obtain a homogeneous layer over the substrate. This was realized by masking with electrophoretically-assembled polystyrene (PS) nanospheres and then electroplating. Drug/biomolecule adsorption and the release characteristics for the porous nanostructures of Ppy were investigated using rhodamine B (Rh-B). Rh-B is an easily detectable small hydrophobic molecule that is used as a model for many drugs or biological substances. The porous Ppy nanostructures with an enhanced surface area exhibited higher Rh-B loading capacity than bulk planar films of Ppy. Moreover, tunability of surface morphology for further applications (e.g., sensing, cell adhesion) was demonstrated.Porous nanostructures of polypyrrole (Ppy) were fabricated using colloidal lithography and electrochemical techniques for potential applications in drug delivery. A sequential fabrication method was developed and optimized to maximize the coverage of the Ppy nanostructures and to obtain a homogeneous layer over the substrate. This was realized by masking with electrophoretically-assembled polystyrene (PS) nanospheres and then electroplating. Drug/biomolecule adsorption and the release characteristics for the porous nanostructures of Ppy were investigated using rhodamine B (Rh-B). Rh-B is an easily detectable small hydrophobic molecule that is used as a model for many drugs or biological substances. The porous Ppy nanostructures with an enhanced surface area exhibited higher Rh-B loading capacity than bulk planar films of Ppy. Moreover, tunability of surface morphology for further applications (e.g., sensing, cell adhesion) was demonstrated. Electronic supplementary information (ESI) available. See DOI: 10.1039/c2nr30192j

  9. Assessment of silicon carbide x-ray mask overlay performance in the IBM Advanced Lithography Facility x-ray stepper

    NASA Astrophysics Data System (ADS)

    Kimmel, Kurt R.; Chen, Alek C.; Powers, Lynn A.; Vampatella, Ben R.

    1995-05-01

    This paper presents the results of a study to explicitly assess the performance of silicon carbide masks by directly measuring overlay accuracy and precision of exposures made on a state-of-the-art commercially available x-ray stepper, the Suss XRS200/3. The work was done using a mask fabricated at IBM from silicon carbide coated wafers obtained from HOYA Electronics Corp. with exposures completed at IBM's Advanced Lithography Facility (ALF) using synchrotron-generated radiation. The mask pattern design contains many overlay measurement fiducials, resolution patterns, and alignment verniers, and two sets of three alignment marks: one set inboard (kerf) and one set outboard. The performance of an imaging-based alignment system, such as the ALX system on the Suss XRS200/3 steppers, varies depending upon the optical characteristics of the alignment marks on the mask and wafer.

  10. Advanced Welding Applications

    NASA Technical Reports Server (NTRS)

    Ding, Robert J.

    2010-01-01

    Some of the applications of advanced welding techniques are shown in this poster presentation. Included are brief explanations of the use on the Ares I and Ares V launch vehicle and on the Space Shuttle Launch vehicle. Also included are microstructural views from four advanced welding techniques: Variable Polarity Plasma Arc (VPPA) weld (fusion), self-reacting friction stir welding (SR-FSW), conventional FSW, and Tube Socket Weld (TSW) on aluminum.

  11. Advanced mask technique to improve bit line CD uniformity of 90 nm node flash memory in low-k1 lithography

    NASA Astrophysics Data System (ADS)

    Kim, Jong-doo; Choi, Jae-young; Kim, Jea-hee; Han, Jae-won

    2008-10-01

    As devices size move toward 90nm technology node or below, defining uniform bit line CD of flash devices is one of the most challenging features to print in KrF lithography. There are two principal difficulties in defining bit line on wafer. One is insufficient process margin besides poor resolution compared with ArF lithography. The other is that asymmetric bit line should be made for OPC(Optical Proximity Correction) modeling. Therefore advanced ArF lithography scanner should be used for define bit line with RETs (Resolution Enhancement Techniques) such as immersion lithography, OPC, PSM(Phase Shift Mask), high NA(Numerical Aperture), OAI(Off-Axis Illumination), SRAF(Sub-resolution Assistant Feature), and mask biasing.. Like this, ArF lithography propose the method of enhancing resolution, however, we must spend an enormous amount of CoC(cost of ownership) to utilize ArF photolithography process than KrF. In this paper, we suggest method to improve of bit line CD uniformity, patterned by KrF lithographic process in 90nm sFlash(stand alone Flash) devices. We applied new scheme of mask manufacturing, which is able to realize 2 different types of mask, binary and phase-shift, into one plate. Finally, we could get the more uniform bit lines and we expect to get more stable properties then before applying this technique.

  12. Characterization of optical material parameters for EUV Lithography applications at PTB

    NASA Astrophysics Data System (ADS)

    Laubis, Christian; Haase, Anton; Soltwisch, Victor; Scholze, Frank

    2015-09-01

    EUV Lithography now reaches the fab floor. The technology ramp up and integration with existing processes will require evolutionary steps in many aspects of the technology. For instance will it be necessary to reduce 3D mask effects like shadowing e.g. by introducing a thinner absorber structure. Continuous progress will be based on using new materials, adapted multilayers, and new reticle designs. Many of these developments are based on simulations and computer models for the design of the required structures and thus require data on the optical properties of the materials involved. In particular when addressing the reticle where the optical function is the target value. Using its more than 25 years of expertise in EUV metrology1, PTB operates instrumentation for reflectometry and scatterometry2 in the EUV and adjacent wavelength ranges and can provide the data for the determination of optical material parameters for individual thin layers. The need for sound optical parameter characterization for the development of alternative EUV materials was thoroughly motivated during the 2015 SPIE Advanced Lithography conference3. The data required is not readily available from databases, as thin film properties - depending on their deposition method and interfaces - may deviate significantly from standard bulk data4. Therefore, better optical constants and a continuous availability of the associated measurement tools are vital for further progress in EUV reticle and optical system design. The ability to vary relevant parameters like wavelength, angle of incidence (AOI), the plane of incidence and polarization is a prerequisite to gather sufficient data to model optical constants. We give details on PTB's measurement capabilities and accessible parameter space for optical material parameter characterization and show some representative data and results.

  13. Advances in mask fabrication and alignment for masked ion-beam lithography

    NASA Astrophysics Data System (ADS)

    Stumbo, David P.; Damm, George A.; Engler, D. W.; Fong, F. O.; Sen, S.; Wolfe, John C.; Randall, John N.; Mauger, Phillip E.; Shimkunas, Alex R.; Loeschne, Hans

    1990-05-01

    This paper describes recent developments in three areas ofmasked ion beam lithography (MIBL). These are 1) fabrication oflarge area, low distortion, silicon stencilmasks for demagnifying ion projection lithography, 2) fabrication ofstencil masks with nanometer scale resolution for 1:1 proximity printing, and 3) development of a direct method of alignment using the ion beam induced fluorescence of Si02. These topics are discussed below. Demagnifying ion projection masks: We describe the fabrication of stencil masks in large area, low stress (10 MPa), n-type silicon membranes. The projection masks have a silicon foil area 95 mm in diameter, thicknesses between 1.5-5 and resolution of0.6um. Measured distortion (3a) in the IPL masks ranges between 0.23gm and 0.65,um, with an experimental error of 0.20 1um. Proximity printing masks: A process is described for fabricating stencil masks with 50 nm resolution in low stress, n-type silicon membranes. Membranes less than 0.5 ,ttm thick are shown to be free of the sidewall taper that limits resolution in thicker masks. These thin membranes show a slightly flared profile due to the imperfectly collimated etching ions. Alignment: A direct method of alignment is being developed which uses the ion beam induced fluorescence of Si02 marks. Fluorescence yield is characterized as a function of ion energy and resist coating thickness. The yield for Si02 is in the range between 0.1-1.0 photons/proton, while the yields for Si, Al, and photoresist are negligibly small. Thus, a simple alignment technique can be implemented where registration of a grating in the mask with a corresponding oxide pattern is detected as a fluorescence maximum. A simple model predicts that 50 nm alignment can be accomplished, following a 1 im prealignment, in 2 seconds.

  14. High refractive index Fresnel lens on a fiber fabricated by nanoimprint lithography for immersion applications

    NASA Astrophysics Data System (ADS)

    Koshelev, Alexander; Calafiore, Giuseppe; Piña-Hernandez, Carlos; Allen, Frances I.; Dhuey, Scott; Sassolini, Simone; Wong, Edward; Lum, Paul; Munechika, Keiko; Cabrini, Stefano

    2016-08-01

    In this Letter we present a Fresnel lens fabricated on the end of an optical fiber. The lens is fabricated using nanoimprint lithography of a functional high refractive index material, which is suitable for mass production. The main advantage of the presented Fresnel lens compared to a conventional fiber lens is its high refractive index (n=1.69), which enables efficient light focusing even inside other media such as water or adhesive. Measurement of the lens performance in an immersion liquid (n=1.51) shows a near diffraction limited focal spot of 810 nm in diameter at the 1/e2 intensity level for a wavelength of 660 nm. Applications of such fiber lenses include integrated optics, optical trapping and fiber probes.

  15. High refractive index Fresnel lens on a fiber fabricated by nanoimprint lithography for immersion applications.

    PubMed

    Koshelev, Alexander; Calafiore, Giuseppe; Piña-Hernandez, Carlos; Allen, Frances I; Dhuey, Scott; Sassolini, Simone; Wong, Edward; Lum, Paul; Munechika, Keiko; Cabrini, Stefano

    2016-08-01

    In this Letter, we present a Fresnel lens fabricated on the end of an optical fiber. The lens is fabricated using nanoimprint lithography of a functional high refractive index material, which is suitable for mass production. The main advantage of the presented Fresnel lens compared to a conventional fiber lens is its high refractive index (n=1.68), which enables efficient light focusing even inside other media, such as water or an adhesive. Measurement of the lens performance in an immersion liquid (n=1.51) shows a near diffraction limited focal spot of 810 nm in diameter at the 1/e2 intensity level for a wavelength of 660 nm. Applications of such fiber lenses include integrated optics, optical trapping, and fiber probes.

  16. Nanoimprint lithography for microfluidics manufacturing

    NASA Astrophysics Data System (ADS)

    Kreindl, Gerald; Matthias, Thorsten

    2013-12-01

    The history of imprint technology as lithography method for pattern replication can be traced back to 1970's but the most significant progress has been made by the research group of S. Chou in the 1990's. Since then, it has become a popular technique with a rapidly growing interest from both research and industrial sides and a variety of new approaches have been proposed along the mainstream scientific advances. Nanoimprint lithography (NIL) is a novel method for the fabrication of micro/nanometer scale patterns with low cost, high throughput and high resolution. Unlike traditional optical lithographic approaches, which create pattern through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the resist and can therefore achieve resolutions beyond the limitations set by light diffraction or beam scattering that are encountered in conventional lithographic techniques. The ability to fabricate structures from the micro- to the nanoscale with high precision in a wide variety of materials is of crucial importance to the advancement of micro- and nanotechnology and the biotech- sciences as a whole and will be discussed in this paper. Nanoimprinting can not only create resist patterns, as in lithography, but can also imprint functional device structures in various polymers, which can lead to a wide range of applications in electronics, photonics, data storage, and biotechnology.

  17. EUV lithography

    NASA Astrophysics Data System (ADS)

    Kemp, Kevin; Wurm, Stefan

    2006-10-01

    Extreme ultraviolet lithography (EUVL) technology and infrastructure development has made excellent progress over the past several years, and tool suppliers are delivering alpha tools to customers. However, requirements in source, mask, optics, and resist are very challenging, and significant development efforts are still needed to support beta and production-level performance. Some of the important advances in the past few years include increased source output power, tool and optics system development and integration, and mask blank defect reduction. For example, source power has increased to levels approaching specification, but reliable source operation at these power levels has yet to be fully demonstrated. Significant efforts are also needed to achieve the resolution, line width roughness, and photospeed requirements for EUV photoresists. Cost of ownership and extendibility to future nodes are key factors in determining the outlook for the manufacturing insertion of EUVL. Since wafer throughput is a critical cost factor, source power, resist sensitivity, and system design all need to be carefully considered. However, if the technical and business challenges can be met, then EUVL will be the likely technology of choice for semiconductor manufacturing at the 32, 22, 16 and 11 nm half-pitch nodes. To cite this article: K. Kemp, S. Wurm, C. R. Physique 7 (2006).

  18. Application of two-photon 3D lithography for the fabrication of embedded ORMOCER waveguides

    NASA Astrophysics Data System (ADS)

    Schmidt, V.; Kuna, L.; Satzinger, V.; Houbertz, R.; Jakopic, G.; Leising, G.

    2007-02-01

    The idea of applying the two-photon 3D lithography (2P-3DL) to an industrial printed wiring board (PWB) fabrication process is quite pioneering. Taking advantage of the unique rapid prototyping properties of 2P-3DL--its particularly inherent true 3D capability and its high flexibility in processing- this lithographic method can be adapted and optimized concerning the direct laser-writing of integrated optical interconnects with tens of microns in diameter. This will push the method forward towards industrial fabrication of next generation PWBs with integrated optical layers, and put it on the leading edge of printed circuit board (PCB) technology. In this context, the concept of a direct laser-written embedded waveguide is based on the local increase of the refractive index of the exposed material, which is triggered by two-photon absorption (TPA) at the laser focus. The laser induced refractive index difference forms the core of the waveguide, whereas the unexposed surrounding material forms the cladding. Thus, only one optical material is required to form the waveguide using true 3D lithographic process compared to other devices, which significantly simplifies processes. The material is subject to stringent requirements concerning the PWB production process: beside its high refractive index change, a low optical loss of the fabricated optical interconnect is required. The integration of the waveguide into the volume of the material also requires thick films up to 500 microns on the PWB substrate, and the material has to withstand the complete PWB fabrication process, where the board is chemically treated and exposed to high temperatures as well as high pressure during the lamination processes of subsequent metal layers. For this application, an inorganic-organic hybrid polymer (ORMOCER) film is applied, casted onto a PWB substrate, and the two-photon 3D lithography system parameters and optics are tuned such that waveguides with a diameter of approx. 30 microns

  19. Development of Nanosphere Lithography Technique with Enhanced Lithographical Accuracy on Periodic Si Nanostructure for Thin Si Solar Cell Application

    NASA Astrophysics Data System (ADS)

    Choi, Jeayoung

    In this thesis, a novel silica nanosphere (SNS) lithography technique has been developed to offer a fast, cost-effective, and large area applicable nano-lithography approach. The SNS can be easily deposited with a simple spin-coating process after introducing a N,N-dimethyl-formamide (DMF) solvent which can produce a highly close packed SNS monolayer over large silicon (Si) surface area, since DMF offers greatly improved wetting, capillary and convective forces in addition to slow solvent evaporation rate. Since the period and dimension of the surface pattern can be conveniently changed and controlled by introducing a desired size of SNS, and additional SNS size reduction with dry etching process, using SNS for lithography provides a highly effective nano-lithography approach for periodically arrayed nano-/micro-scale surface patterns with a desired dimension and period. Various Si nanostructures ( i.e., nanopillar, nanotip, inverted pyramid, nanohole) are successfully fabricated with the SNS nano-lithography technique by using different etching technique like anisotropic alkaline solution (i.e., KOH) etching, reactive-ion etching (RIE), and metal-assisted chemical etching (MaCE). In this research, computational optical modeling is also introduced to design the Si nanostructure, specifically nanopillars (NPs) with a desired period and dimension. The optical properties of Si NP are calculated with two different optical modeling techniques, which are the rigorous coupled wave analysis (RCWA) and finite-difference time-domain (FDTD) methods. By using these two different optical modeling techniques, the optical properties of Si NPs with different periods and dimensions have been investigated to design ideal Si NP which can be potentially used for thin c-Si solar cell applications. From the results of the computational and experimental work, it was observed that low aspect ratio Si NPs fabricated in a periodic hexagonal array can provide highly enhanced light absorption

  20. Thick SU8 microstructures prepared by broadband UV lithography and the applications in MEMS devices

    NASA Astrophysics Data System (ADS)

    Li, Dong-ling; Wen, Zhi-yu; Shang, Zheng-guo; She, Yin

    2016-05-01

    Thick SU8 microstructures with high aspect ratio and good side wall quality were fabricated by ultraviolet (UV) lithography, and the processing parameters were comprehensively studied. It proves that the adhesion of SU8 on silicon (Si) substrates is influenced by Si-OH on the surface, and can be improved by the HF treatment. Cracks and delamination are caused by large internal stress during fabrication process, and are significantly influenced by soft bake and post-exposure bake processes. The internal stress is reduced by a low post-exposure bake exposure temperature of 85 °C for 40 min. A three-step soft bake enhances the reflowing of SU8 photoresist, and results in uniform surface and less air bubbles. The vertical side wall is obtained with the optimized exposure dose of 800 mJ/cm2 for the thickness of 160 μm. Using the optimized fabrication process combined with a proper structure design, dense SU8 micro pillars are achieved with the aspect ratio of 10 and the taper angle of 89.86°. Finally, some possible applications of SU8 in micro-electromechanical system (MEMS) device are developed and demonstrated.

  1. Indus-2 X-ray lithography beamline for X-ray optics and material science applications

    SciTech Connect

    Dhamgaye, V. P. Lodha, G. S.

    2014-04-24

    X-ray lithography is an ideal technique by which high aspect ratio and high spatial resolution micro/nano structures are fabricated using X-rays from synchrotron radiation source. The technique has been used for fabricating optics (X-ray, visible and infrared), sensors and actuators, fluidics and photonics. A beamline for X-ray lithography is operational on Indus-2. The beamline offers wide lithographic window from 1-40keV photon energy and wide beam for producing microstructures in polymers upto size ∼100mm × 100mm. X-ray exposures are possible in air, vacuum and He gas environment. The air based exposures enables the X-ray irradiation of resist for lithography and also irradiation of biological and liquid samples.

  2. Improvement of lithography process by using a FlexRay illuminator for memory applications

    NASA Astrophysics Data System (ADS)

    Huang, Thomas; Huang, Chun-Yen; Chiou, Tsann-Bim; Hsu, Michael; Shih, Chiang-Lin; Chen, Alek; Wei, Ming-Kang

    2011-04-01

    As is well recognized, source mask optimization (SMO) is a highly effective means of extending the lifetime of a certain photolithography generation without an expensive upgrade to the next generation optical system. More than an academic theory, source optimization first found practical applications in the debut of the pixel-like programmable illuminator in 2009 for producing near freeform illumination. Based on programmed illumination, related studies have demonstrated a nearly identical optical performance to that generated by the conventionally adopted diffractive optical element (DOE) device without the prolonged manufacturing time and relatively high cost of stocking up various DOEs. By using a commercially available pixel-like programmable illuminator from ASML, i.e. the FlexRay, this study investigates the effectiveness of FlexRay in enhancing image contrast and common process window. Before wafer exposure, full SMO and source-only (SO) optimization are implemented by Tachyon SMO software to select the optimum illumination source. Wafer exposure is performed by ASML XT:1950i scanner equipped with a FlexRay illuminator on a critical layer of DRAM process with known hotspots of resist peeling. Pupil information is collected by a sensor embedded in the scanner to confirm the produced source shape against the programmed source and the optically simulated CD. When the FlexRay illuminator is used, experimental results indicate that lithography hotspots are eliminated and depth of focus is improved by as much as 50% in comparison with those from a traditional AERIAL illuminator. Regular focus-exposure matrix (FEM) and the subsequent critical defects scanning reveal that the common process window of the tight-pitched array and the periphery can be enhanced simultaneously with no hotspot identified. Therefore, a programmed source is undoubtedly invaluable in terms of additional manufacturing flexibility and lower cost of ownership when attempting to improve product

  3. Plasmonic films based on colloidal lithography.

    PubMed

    Ai, Bin; Yu, Ye; Möhwald, Helmuth; Zhang, Gang; Yang, Bai

    2014-04-01

    This paper reviews recent advances in the field of plasmonic films fabricated by colloidal lithography. Compared with conventional lithography techniques such as electron beam lithography and focused ion beam lithography, the unconventional colloidal lithography technique with advantages of low-cost and high-throughput has made the fabrication process more efficient, and moreover brought out novel films that show remarkable surface plasmon features. These plasmonic films include those with nanohole arrays, nanovoid arrays and nanoshell arrays with precisely controlled shapes, sizes, and spacing. Based on these novel nanostructures, optical and sensing performances can be greatly enhanced. The introduction of colloidal lithography provides not only efficient fabrication processes but also plasmonic films with unique nanostructures, which are difficult to be fabricated by conventional lithography techniques.

  4. Radiation induced surface modification and contamination for EUV lithography and fusion applications

    NASA Astrophysics Data System (ADS)

    Al-Ajlony, Al-Montaser Bellah

    Al-Montaser Bellah Al-Ajlony. Ph.D., Purdue University, May 2014. Radiation Induced Surface Modification and Contamination for EUV Lithography and Fusion Applications. Major Professor: Ahmed Hassanein. The effect of ionizing radiation on materials surfaces is of major interest for many engineering applications. The importance of this topic rises from the severity of the implications that a surface at a certain application might suffer due its interaction with some sort of ionizing radiation. The severity of implication is not always related to the severity of the radiation, in many applications the concern comes from the over-sensitivity of the surface to a low doses of radiations. One example of these sensitive applications is the extreme ultraviolet (EUV) induced surface contaminations of the optics in EUV lithography devices. In this application, a small dose of ionizing radiation (EUV at 13.5 nm wavelength) can cause slight change in the chemical composition of the irradiated surface. This change in chemical composition can cause large change in the surface optical properties of the irradiated surface (EUV optics). This degradation in reflectivity is an issue that needs to be avoided. On the other extreme where intense radiation is implemented, the main concern of the radiation-surface interaction comes from the severity of the irradiation process. The plasma-facing component (PFC) in future thermonuclear devices represent the ultimate example where the materials might be exposed to severe irradiation processes. Under such extreme irradiation processes, some candidate PFC materials exhibit the formation of very fine and fragile nanostructure (Fuzz) that can be washed out into the fusion device plasma and stop the fusion reaction. These two extreme examples of the radiation-surface interaction were selected to be my PhD research topic. The change in chemical properties of Ru surface during exposure to a 13.5 nm wavelength of EUV light radiation was investigated

  5. Phototocatalytic Lithography of Poly(Propylene Sulfide) Block Copolymers: Towards High Throughput Nanolithography for Biomolecular Arraying Applications

    PubMed Central

    Stone, Gary; Hiddessen, Amy L.; Dugan, Lawrence C.; Wu, Ligang; Hailey, Philip; Conway, James W.; Kuenzler, Tobias; Feller, Lydia; Cerritelli, Simona; Hubbell, Jeffrey A.

    2009-01-01

    Photocatalytic lithography (PCL) is an inexpensive, fast and robust method of oxidizing surface chemical moieties to produce patterned substrates. This technique has utility in basic biological research, as well as various biochip applications. We report on porphyrin-based PCL for patterning poly(propylene sulfide) block copolymer films on gold substrates at the micron and sub-micron scale. We confirm chemical patterning with imaging ToF-SIMS and low voltage SEM. Biomolecular patterning on micron and submicron scales is demonstrated with proteins, protein-linked beads and fluorescently labeled proteins. PMID:19113808

  6. Microphotonic parabolic light directors fabricated by two-photon lithography

    SciTech Connect

    Atwater, J. H.; Spinelli, P.; Kosten, E.; Parsons, J.; Van Lare, C.; Van de Groep, J.; Garcia de Abajo, J.; Polman, A.; Atwater, H. A.

    2011-10-10

    We have fabricated microphotonic parabolic light directors using two-photon lithography, thin-film processing, and aperture formation by focused ion beam lithography. Optical transmission measurements through upright parabolic directors 22 μm high and 10 μm in diameter exhibit strong beam directivity with a beam divergence of 5.6°, in reasonable agreement with ray-tracing and full-field electromagnetic simulations. The results indicate the suitability of microphotonic parabolic light directors for producing collimated beams for applications in advanced solar cell and light-emitting diode designs.

  7. Fabrication of quantum dot microarrays using electron beam lithography for applications in analyte sensing and cellular dynamics.

    PubMed

    Palankar, Raghavendra; Medvedev, Nikolay; Rong, Alena; Delcea, Mihaela

    2013-05-28

    Quantum dot (QD) based micro-/nanopatterned arrays are of broad interest in applications ranging from electronics, photonics, to sensor devices for biomedical purposes. Here, we report on a rapid, physico-chemically mild approach to generate high fidelity micropattern arrays of prefunctionalized water-soluble quantum dots using electron beam lithography. We show that such patterns retain their fluorescence and bioaffinity upon electron beam lithography and, based on the streptavidin-biotin interaction, allow for detection of proteins, colloidal gold nanoparticles and magnetic microparticles. Furthermore, we demonstrate the applicability of QD based microarray patterns differing in their shape (circles, squares, grid-like), size (from 1 to 10 μm) and pitch distance to study the adhesion, spreading and migration of human blood derived neutrophils. Using live cell confocal fluorescence microscopy, we show that pattern geometry and pitch distance influence the adhesion, spreading and migratory behavior of neutrophils. Research reported in this work paves the way for producing QD microarrays with multiplexed functionalities relevant for applications in analyte sensing and cellular dynamics.

  8. Uniformity of LED light illumination in application to direct imaging lithography

    NASA Astrophysics Data System (ADS)

    Huang, Ting-Ming; Chang, Shenq-Tsong; Tsay, Ho-Lin; Hsu, Ming-Ying; Chen, Fong-Zhi

    2016-09-01

    Direct imaging has widely applied in lithography for a long time because of its simplicity and easy-maintenance. Although this method has limitation of lithography resolution, it is still adopted in industries. Uniformity of UV irradiance for a designed area is an important requirement. While mercury lamps were used as the light source in the early stage, LEDs have drawn a lot of attention for consideration from several aspects. Although LED has better and better performance, arrays of LEDs are required to obtain desired irradiance because of limitation of brightness for a single LED. Several effects are considered that affect the uniformity of UV irradiance such as alignment of optics, temperature of each LED, performance of each LED due to production uniformity, and pointing of LED module. Effects of these factors are considered to study the uniformity of LED Light Illumination. Numerical analysis is performed by assuming a serious of control factors to have a better understanding of each factor.

  9. Post-lithography pattern modification and its application to a tunable wire grid polarizer.

    PubMed

    Stach, Michal; Chang, En-Chiang; Yang, Chung-Yuan; Lo, Cheng-Yao

    2013-03-22

    This study reports a simple and cost-effective post-lithography solution for reducing the characteristic dimensions of structures on the nanometer scale using an external mechanical force without any modification of the existing exposure system. In particular, this study presents a tunable aluminum wire grid polarizer (WGP) made by a laser interference lithography and i-line (365 nm) exposure setup on polyethylene naphthalate. The WGP achieves a 58% maximum linewidth shrinkage of the metal nanowire on the polymer substrate, and further improved the polarization extinction ratio by 83% with a defined operation window and optimized strain. The simulations in this study prove the rise of the extinction ratio with the modulation of the WGP pattern. Physical evidence explains the fall of the extinction ratio for both the increase of the metal crack volume and the delaminated randomly oriented fall-on fragments under extensive operation.

  10. Successful demonstration of a comprehensive lithography defect monitoring strategy

    NASA Astrophysics Data System (ADS)

    Peterson, Ingrid B.; Breaux, Louis H.; Cross, Andrew; von den Hoff, Michael

    2003-07-01

    This paper describes the validation of the methodology, the model and the impact of an optimized Lithography Defect Monitoring Strategy at two different semiconductor manufacturing factories. The lithography defect inspection optimization was implemented for the Gate Module at both factories running 0.13-0.15μm technologies on 200mm wafers, one running microprocessor and the other memory devices. As minimum dimensions and process windows decrease in the lithography area, new technologies and technological advances with resists and resist systems are being implemented to meet the demands. Along with these new technological advances in the lithography area comes potentially unforeseen defect issues. The latest lithography processes involve new resists in extremely thin, uniform films, exposing the films under conditions of highly optimized focus and illumination, and finally removing the resist completely and cleanly. The lithography cell is defined as the cluster of process equipment that accomplishes the coating process (surface prep, resist spin, edge-bead removal and soft bake), the alignment and exposure, and the developing process (post-exposure bake, develop, rinse) of the resist. Often the resist spinning process involves multiple materials such as BARC (bottom ARC) and / or TARC (top ARC) materials in addition to the resist itself. The introduction of these new materials with the multiple materials interfaces and the tightness of the process windows leads to an increased variety of defect mechanisms in the lithography area. Defect management in the lithography area has become critical to successful product introduction and yield ramp. The semiconductor process itself contributes the largest number and variety of defects, and a significant portion of the total defects originate within the lithography cell. From a defect management perspective, the lithography cell has some unique characteristics. First, defects in the lithography process module have the

  11. Immersion lithography bevel solutions

    NASA Astrophysics Data System (ADS)

    Tedeschi, Len; Tamada, Osamu; Sanada, Masakazu; Yasuda, Shuichi; Asai, Masaya

    2008-03-01

    The introduction of Immersion lithography, combined with the desire to maximize the number of potential yielding devices per wafer, has brought wafer edge engineering to the forefront for advanced semiconductor manufactures. Bevel cleanliness, the position accuracy of the lithography films, and quality of the EBR cut has become more critical. In this paper, the effectiveness of wafer track based solutions to enable state-of-art bevel schemes is explored. This includes an integrated bevel cleaner and new bevel rinse nozzles. The bevel rinse nozzles are used in the coating process to ensure a precise, clean film edge on or near the bevel. The bevel cleaner is used immediately before the wafer is loaded into the scanner after the coating process. The bevel cleaner shows promise in driving down defectivity levels, specifically printing particles, while not damaging films on the bevel.

  12. Application of alternating PSM to sub-quarter-micrometer technology using i-line lithography

    NASA Astrophysics Data System (ADS)

    Kim, Hung-Eil; Ahn, Chang-Nam; Kim, KeunYoung; Baik, Ki-Ho

    1995-12-01

    Alternating phase shift mask (PSM) is very effective to memory devices which have highly repeated patterns. In order to apply the alternating PSM to a real device, we have investigated the design problems such as proximity effect, phase contradiction, phase transition, and linewidth variation. We also designed various hard defects to check defect printability on a wafer. Using i-line lithography (0.50 NA, 0.46 sigma) with alternating PSM, we obtained a useful DOF of 1.2 micrometer for a bit line of 256 M DRAM. The experimental and simulation results for phase-induced problems and defect printability on wafer are described in detail.

  13. Fundamental study of optical threshold layer approach towards double exposure lithography

    NASA Astrophysics Data System (ADS)

    Gu, Xinyu; Berro, Adam J.; Cho, Younjin; Jen, Kane; Lee, Saul; Ngai, Tomoki; Ogata, Toshiyuki; Durand, William J.; Sundaresan, Arunkumar; Lancaster, Jeffrey R.; Jockusch, Steffen; Zimmerman, Paul; Turro, Nicholas J.; Willson, C. G.

    2009-03-01

    193 immersion lithography has reached its maximal achievable resolution. There are mainly two lithographic strategies that will enable continued increase in resolution. Those are being pursued in parallel. The first is extreme ultraviolet (EUV) lithography and the second is double patterning (exposure) lithography. EUV lithography is counted on to be available in 2013 time frame for 22 nm node. Unfortunately, this technology has suffered several delays due to fundamental problems with source power, mask infrastructure, metrology and overall reliability. The implementation of EUV lithography in the next five years is unlikely due to economic factors. Double patterning lithography (DPL) is a technology that has been implemented by the industry and has already shown the proof of concept for the 22nm node. This technique while expensive is the only current path forward for scaling with no fundamental showstoppers for the 32nm and 22nm nodes. Double exposure lithography (DEL) is being proposed as a cost mitigating approach to advanced lithography. Compared to DPL, DEL offers advantages in overlay and process time, thus reducing the cost-of-ownership (CoO). However, DEL requires new materials that have a non-linear photoresponse. So far, several approaches were proposed for double exposure lithography, from which Optical Threshold Layer (OTL) was found to give the best lithography performance according to the results of the simulation. This paper details the principle of the OTL approach. A photochromic polymer was designed and synthesized. The feasibility of the material for application of DEL was explored by a series of evaluations.

  14. Charting CEBL's role in mainstream semiconductor lithography

    NASA Astrophysics Data System (ADS)

    Lam, David K.

    2013-09-01

    historically kept it out of mainstream fabs. Thanks to continuing EBDW advances combined with the industry's move to unidirectional (1D) gridded layout style, EBDW promises to cost-efficiently complement 193nm ArF immersion (193i) optical lithography in high volume manufacturing (HVM). Patterning conventional 2D design layouts with 193i is a major roadblock in device scaling: the resolution limitations of optical lithography equipment have led to higher mask cost and increased lithography complexity. To overcome the challenge, IC designers have used 1D layouts with "lines and cuts" in critical layers.1 Leading logic and memory chipmakers have been producing advanced designs with lines-and-cuts in HVM for several technology nodes in recent years. However, cut masks in multiple optical patterning are getting extremely costly. Borodovsky proposes Complementary Lithography in which another lithography technology is used to pattern line-cuts in critical layers to complement optical lithography.2 Complementary E-Beam Lithography (CEBL) is a candidate to pattern the Cuts of optically printed Lines. The concept of CEBL is gaining acceptance. However, challenges in throughput, scaling, and data preparation rate are threatening to deny CEBL's role in solving industry's lithography problem. This paper will examine the following issues: The challenges of massively parallel pixel writing The solutions of multiple mini-column design/architecture in: Boosting CEBL throughput Resolving issues of CD control, CDU, LER, data rate, higher resolution, and 450mm wafers The role of CEBL in next-generation solution of semiconductor lithography

  15. Immersion and dry lithography monitoring for flash memories (after develop inspection and photo cell monitor) using a darkfield imaging inspector with advanced binning technology

    NASA Astrophysics Data System (ADS)

    Parisi, P.; Mani, A.; Perry-Sullivan, C.; Kopp, J.; Simpson, G.; Renis, M.; Padovani, M.; Severgnini, C.; Piacentini, P.; Piazza, P.; Beccalli, A.

    2009-12-01

    After-develop inspection (ADI) and photo-cell monitoring (PM) are part of a comprehensive lithography process monitoring strategy. Capturing defects of interest (DOI) in the lithography cell rather than at later process steps shortens the cycle time and allows for wafer re-work, reducing overall cost and improving yield. Low contrast DOI and multiple noise sources make litho inspection challenging. Broadband brightfield inspectors provide the highest sensitivity to litho DOI and are traditionally used for ADI and PM. However, a darkfield imaging inspector has shown sufficient sensitivity to litho DOI, providing a high-throughput option for litho defect monitoring. On the darkfield imaging inspector, a very high sensitivity inspection is used in conjunction with advanced defect binning to detect pattern issues and other DOI and minimize nuisance defects. For ADI, this darkfield inspection methodology enables the separation and tracking of 'color variation' defects that correlate directly to CD variations allowing a high-sampling monitor for focus excursions, thereby reducing scanner re-qualification time. For PM, the darkfield imaging inspector provides sensitivity to critical immersion litho defects at a lower cost-of-ownership. This paper describes litho monitoring methodologies developed and implemented for flash devices for 65nm production and 45nm development using the darkfield imaging inspector.

  16. Coaxial lithography.

    PubMed

    Ozel, Tuncay; Bourret, Gilles R; Mirkin, Chad A

    2015-04-01

    The optical and electrical properties of heterogeneous nanowires are profoundly related to their composition and nanoscale architecture. However, the intrinsic constraints of conventional synthetic and lithographic techniques have limited the types of multi-compositional nanowire that can be created and studied in the laboratory. Here, we report a high-throughput technique that can be used to prepare coaxial nanowires with sub-10 nm control over the architectural parameters in both axial and radial dimensions. The method, termed coaxial lithography (COAL), relies on templated electrochemical synthesis and can create coaxial nanowires composed of combinations of metals, metal oxides, metal chalcogenides and conjugated polymers. To illustrate the possibilities of the technique, a core/shell semiconductor nanowire with an embedded plasmonic nanoring was synthesized--a structure that cannot be prepared by any previously known method--and its plasmon-excitation-dependent optoelectronic properties were characterized.

  17. VUV lithography

    DOEpatents

    George, Edward V.; Oster, Yale; Mundinger, David C.

    1990-01-01

    Deep UV projection lithography can be performed using an e-beam pumped solid excimer UV source, a mask, and a UV reduction camera. The UV source produces deep UV radiation in the range 1700-1300A using xenon, krypton or argon; shorter wavelengths of 850-650A can be obtained using neon or helium. A thin solid layer of the gas is formed on a cryogenically cooled plate and bombarded with an e-beam to cause fluorescence. The UV reduction camera utilizes multilayer mirrors having high reflectivity at the UV wavelength and images the mask onto a resist coated substrate at a preselected demagnification. The mask can be formed integrally with the source as an emitting mask.

  18. VUV lithography

    DOEpatents

    George, E.V.; Oster, Y.; Mundinger, D.C.

    1990-12-25

    Deep UV projection lithography can be performed using an e-beam pumped solid excimer UV source, a mask, and a UV reduction camera. The UV source produces deep UV radiation in the range 1,700--1,300A using xenon, krypton or argon; shorter wavelengths of 850--650A can be obtained using neon or helium. A thin solid layer of the gas is formed on a cryogenically cooled plate and bombarded with an e-beam to cause fluorescence. The UV reduction camera utilizes multilayer mirrors having high reflectivity at the UV wavelength and images the mask onto a resist coated substrate at a preselected demagnification. The mask can be formed integrally with the source as an emitting mask. 6 figs.

  19. Run time scanner data analysis for HVM lithography process monitoring and stability control

    NASA Astrophysics Data System (ADS)

    Chung, Woong Jae; Kim, Young Ki; Tristan, John; Kim, Jeong Soo; Subramany, Lokesh; Li, Chen; Riggs, Brent; Ramanathan, Vidya; Karur-Shanmugam, Ram; Hoo, George; Gao, Jie; Golotsvan, Anna; Huang, Kevin; Pierson, Bill; Robinson, John

    2014-04-01

    There are various data mining and analysis tools in use by high-volume semiconductor manufacturers throughout the industry that seek to provide robust monitoring and analysis capabilities for the purpose of maintaining a stable lithography process. These tools exist in both online and offline formats and draw upon data from various sources for monitoring and analysis. This paper explores several possible use cases of run-time scanner data to provide advanced overlay and imaging analysis for scanner lithography signatures. Here we demonstrate several use-cases for analyzing and stabilizing lithography processes. Applications include high order wafer alignment simulations in which an optimal alignment strategy is determined by dynamic wafer selection, reporting statistics data and analysis of the lot report and the sub-recipe as a sort of non-standard lot report, visualization of key lithography process parameters, and scanner fleet management (SFM)

  20. Advanced Accelerators for Medical Applications

    NASA Astrophysics Data System (ADS)

    Uesaka, Mitsuru; Koyama, Kazuyoshi

    We review advanced accelerators for medical applications with respect to the following key technologies: (i) higher RF electron linear accelerator (hereafter “linac”); (ii) optimization of alignment for the proton linac, cyclotron and synchrotron; (iii) superconducting magnet; (iv) laser technology. Advanced accelerators for medical applications are categorized into two groups. The first group consists of compact medical linacs with high RF, cyclotrons and synchrotrons downsized by optimization of alignment and superconducting magnets. The second group comprises laser-based acceleration systems aimed of medical applications in the future. Laser plasma electron/ion accelerating systems for cancer therapy and laser dielectric accelerating systems for radiation biology are mentioned. Since the second group has important potential for a compact system, the current status of the established energy and intensity and of the required stability are given.

  1. Adhesive-tape soft lithography for patterning mammalian cells: application to wound-healing assays.

    PubMed

    Shrirao, Anil B; Hussain, Ali; Cho, Cheul H; Perez-Castillejos, Raquel

    2012-09-13

    This paper introduces a benchtop method for patterning mammalian cells-i.e., for culturing cells at specific locations-on planar substrates. Compared with standard cell culture techniques, which do not allow the control of what areas of a monolayer are populated by one type of cell or another, techniques of cell patterning open new routes to cell biology. Researchers interested in cell patterning, however, are often times hindered by limited access to photolithographic capabilities. This paper shows how cells can be patterned easily with sub-millimeter precision using a non-photolithographic technique that is based on the use of office adhesive tape and poly(dimethylsiloxane) (PDMS). This method is fast (~4 h to go from a layout to have the cells patterned in the shape of such layout) and only requires materials and tools readily available in a conventional biomedical laboratory. A wound-healing assay is presented here that illustrates the potential of the technique (which we call tape-based soft lithography) for patterning mammalian cells and studying biologically significant questions such as collective cellular migration.

  2. Patterning, Characterization and Chemical Sensing Applications of Graphene Nanoribbon Arrays Down to 5 nm Using Helium Ion Beam Lithography

    NASA Astrophysics Data System (ADS)

    Abbas, Ahmad; Liu, Gang; Liu, Bilu; Zhang, Luyao; Liu, He; Ohlberg, Douglas; Wu, Wei; Zhou, Chongwu

    2014-03-01

    Bandgap engineering of graphene is an essential step towards employing graphene in electronic and sensing applications. Recently, graphene nanoribbons (GNRs) were used to create a bandgap in graphene and function as a semiconducting switch. Although GNRs with widths of <10 nm have been achieved, problems like GNR alignment, width control, uniformity, high aspect ratios, and edge roughness must be resolved in order to introduce GNRs as a robust alternative technology. Here we report patterning, characterization and superior chemical sensing of ultra-narrow aligned GNR arrays down to 5 nm width using helium ion beam lithography (HIBL) for the first time. The patterned GNR arrays possess narrow and adjustable widths, high aspect ratios, and relatively high quality. Field-effect transistors were fabricated on such GNR arrays and temperature-dependent transport measurements show the thermally activated carrier transport in the GNR array structure. Furthermore, we have demonstrated exceptional NO2 gas sensitivity of the 5 nm GNR array devices down to ppb levels. The results show the potential of HIBL fabricated GNRs for the electronic and sensing applications. We would like to thank HP labs for the use of helium ion microscope. We thank Professor Kang L. Wang and Stephen B. Cronin for help with some of the experiments. We acknowledge the office of Naval Research for financial support.

  3. Benzophenone doped polydimethylsiloxane: self developable composite resist system for its use in a direct write laser lithography application

    NASA Astrophysics Data System (ADS)

    Bute, Madhushree G.; Shinde, Shashikant D.; Bodas, Dhananjay; Fouad, H.; Adhi, K. P.; Gosavi, S. W.

    2015-05-01

    This paper reports a benzophenone doped polydimethylsiloxane (PDMS) composite resist system, for micro patterning using direct write laser lithography for its use in lab-on-chip (LOC) applications. A 248 nm excimer laser with a 20 ns pulse width is used for microfabrication of doped-PDMS. The effect of two major aspects viz. resist composition and laser processing parameters on the quality of fabricated microstructures is studied and optimized. The lithographic analysis reveals that the doped-PDMS shows self developable sensitivity at lower threshold fluence, 250 mJ cm-2. The optimized composition ratio 10: 1: 0.3 (wt%) of the PDMS monomer: curing agent: Benzophenone (P:C:B) is used for processing and analysis. Comprehensive analysis on the effect of laser ablation parameters (fluence, frequency and number of laser pulses) on etching performance (etch rate, geometry of micropattern and quality of surface) is presented. Increase in etch rate with fluence (250-650 mJ cm-2) is observed and considered to be in a working range. Simultaneously, increase in surface roughness as a function of fluence >650 mJ cm-2 is observed which can be associated with rapid rise in the photothermal decomposition of the composite resist. However pulse repetition rate (PRR) at 1, 5 and 10 Hz does not offer any significant effect on etch rate. The surface quality at a higher PRR is deprived due to redeposition of ablated material which concludes 1 Hz as a suitable working frequency. The deterioration of surface quality with increasing PRR is associated with the formation of a heat affected zone, due to cumulative heating, as the increase in temperature Δ T≤ft(TsN+1-{{T}s}\\right) is 362 °C at 5 Hz and 624 °C at 10 Hz, above Ts ~ 1099 °C for 1 Hz. However, the number of pulses and etch rate are inversely related due to the plume effect. The overall study provides a guideline for precise control on fast prototyping direct write laser lithography processes

  4. Porphyrin-Based Photocatalytic Lithography

    SciTech Connect

    Bearinger, J; Stone, G; Christian, A; Dugan, L; Hiddessen, A; Wu, K J; Wu, L; Hamilton, J; Stockton, C; Hubbell, J

    2007-10-15

    Photocatalytic lithography is an emerging technique that couples light with coated mask materials in order to pattern surface chemistry. We excite porphyrins to create radical species that photocatalytically oxidize, and thereby pattern, chemistries in the local vicinity. The technique advantageously does not necessitate mass transport or specified substrates, it is fast and robust and the wavelength of light does not limit the resolution of patterned features. We have patterned proteins and cells in order to demonstrate the utility of photocatalytic lithography in life science applications.

  5. Advances in uncooled systems applications

    NASA Astrophysics Data System (ADS)

    Anderson, John S.; Bradley, Daryl; Chen, Chungte W.; Chin, Richard; Gonzalez, H.; Hegg, Ronald G.; Kostrzewa, K.; Le Pere, C.; Ton, S.; Kennedy, Adam; Murphy, Daniel F.; Ray, Michael; Wyles, Richard; Miller, James E.; Newsome, Gwendolyn W.

    2003-09-01

    The Low Cost Microsensors (LCMS) Program recently demonstrated state-of-the-art imagery in a long-range infrared (IR) sensor built upon an uncooled vanadium oxide (VOx) 640 x 480 format focal plane array (FPA) engine. The 640 x 480 sensor is applicable to long-range surveillance and targeting missions. The intent of this DUS&T effort was to further reduce the cost, weight, and power of uncooled IR sensors, and to increase the capability of these sensors, thereby expanding their applicability to military and commercial markets never before addressed by thermal imaging. In addition, the Advanced Uncooled Thermal Imaging Sensors (AUTIS) Program extended this development to light-weight, compact unmanned aerial vehicle (UAV) applications.

  6. Application of natural linear polysaccharide to green resist polymers for electron beam and extreme-ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Takei, Satoshi; Oshima, Akihiro; Oyama, Tomoko G.; Ito, Kenta; Sugahara, Kigen; Kashiwakura, Miki; Kozawa, Takahiro; Tagawa, Seiichi; Hanabata, Makoto

    2014-11-01

    The application of natural linear polysaccharide to green resist polymers was demonstrated for electron beam (EB) and extreme-ultraviolet (EUV) lithography using organic-solvent-free water spin-coating and tetramethylammonium hydroxide (TMAH)-free water-developable techniques. The water spin-coating and water-developable processes in a green resist material were carried out on wafers because of the water solubility of natural polysaccharides for an environmentally friendly manufacturing process for next-generation electronic devices. The developed green resist material with a weight-average molecular weight of 83,000 and 70 mol % hydroxyl groups as a water-developable feature was found to have acceptable properties such as spin-coat ability on 200 mm wafers, prediction sensitivity to EUV at the wavelengths of 6.7 and 13.5 nm, a high contrast of the water dissolution rate before and after EB irradiation, pillar patterns of 100-400 nm with a high EB sensitivity of 10 µC/cm2, and etch selectivity with a silicon-based middle layer in CF4 plasma treatment.

  7. Bioimprinting strategies: from soft lithography to biomimetic sensors and beyond.

    PubMed

    Mujahid, Adnan; Iqbal, Naseer; Afzal, Adeel

    2013-12-01

    Imprinting is a straightforward, yet a reliable technique to develop dynamic artificial recognition materials-so called as synthetic antibodies. Surface imprinting strategies such as soft lithography allow biological stereotyping of polymers and sol-gel phases to prepare extremely selective receptor layers, which can be combined with suitable transducer systems to develop high performance biomimetic sensors. This article presents an overview of the remarkable technical advancements in the field of surface bioimprinting with particular emphasis on surface imprinted bioanalyte detection systems and their applications in rapid bioanalysis and biotechnology. Herein, we discuss a variety of surface imprinting strategies including soft lithography, template immobilization, grafting, emulsion polymerization, and others along with their biomimetic sensor applications, merits and demerits. The pioneering research works on surface patterned biosensors are described with selected examples of detecting biological agents ranging from small biomolecules and proteins to living cells and microorganisms.

  8. Bubble-Pen Lithography.

    PubMed

    Lin, Linhan; Peng, Xiaolei; Mao, Zhangming; Li, Wei; Yogeesh, Maruthi N; Rajeeva, Bharath Bangalore; Perillo, Evan P; Dunn, Andrew K; Akinwande, Deji; Zheng, Yuebing

    2016-01-13

    Current lithography techniques, which employ photon, electron, or ion beams to induce chemical or physical reactions for micro/nano-fabrication, have remained challenging in patterning chemically synthesized colloidal particles, which are emerging as building blocks for functional devices. Herein, we develop a new technique - bubble-pen lithography (BPL) - to pattern colloidal particles on substrates using optically controlled microbubbles. Briefly, a single laser beam generates a microbubble at the interface of colloidal suspension and a plasmonic substrate via plasmon-enhanced photothermal effects. The microbubble captures and immobilizes the colloidal particles on the substrate through coordinated actions of Marangoni convection, surface tension, gas pressure, and substrate adhesion. Through directing the laser beam to move the microbubble, we create arbitrary single-particle patterns and particle assemblies with different resolutions and architectures. Furthermore, we have applied BPL to pattern CdSe/ZnS quantum dots on plasmonic substrates and polystyrene (PS) microparticles on two-dimensional (2D) atomic-layer materials. With the low-power operation, arbitrary patterning and applicability to general colloidal particles, BPL will find a wide range of applications in microelectronics, nanophotonics, and nanomedicine.

  9. Maskless, reticle-free, lithography

    DOEpatents

    Ceglio, Natale M.; Markle, David A.

    1997-11-25

    A lithography system in which the mask or reticle, which usually carries the pattern to be printed onto a substrate, is replaced by a programmable array of binary (i.e. on/off) light valves or switches which can be programmed to replicate a portion of the pattern each time an illuminating light source is flashed. The pattern of light produced by the programmable array is imaged onto a lithographic substrate which is mounted on a scanning stage as is common in optical lithography. The stage motion and the pattern of light displayed by the programmable array are precisely synchronized with the flashing illumination system so that each flash accurately positions the image of the pattern on the substrate. This is achieved by advancing the pattern held in the programmable array by an amount which corresponds to the travel of the substrate stage each time the light source flashes. In this manner the image is built up of multiple flashes and an isolated defect in the array will only have a small effect on the printed pattern. The method includes projection lithographies using radiation other than optical or ultraviolet light. The programmable array of binary switches would be used to control extreme ultraviolet (EUV), x-ray, or electron, illumination systems, obviating the need for stable, defect free masks for projection EUV, x-ray, or electron, lithographies.

  10. Maskless, reticle-free, lithography

    DOEpatents

    Ceglio, N.M.; Markle, D.A.

    1997-11-25

    A lithography system in which the mask or reticle, which usually carries the pattern to be printed onto a substrate, is replaced by a programmable array of binary (i.e. on/off) light valves or switches which can be programmed to replicate a portion of the pattern each time an illuminating light source is flashed. The pattern of light produced by the programmable array is imaged onto a lithographic substrate which is mounted on a scanning stage as is common in optical lithography. The stage motion and the pattern of light displayed by the programmable array are precisely synchronized with the flashing illumination system so that each flash accurately positions the image of the pattern on the substrate. This is achieved by advancing the pattern held in the programmable array by an amount which corresponds to the travel of the substrate stage each time the light source flashes. In this manner the image is built up of multiple flashes and an isolated defect in the array will only have a small effect on the printed pattern. The method includes projection lithographies using radiation other than optical or ultraviolet light. The programmable array of binary switches would be used to control extreme ultraviolet (EUV), x-ray, or electron, illumination systems, obviating the need for stable, defect free masks for projection EUV, x-ray, or electron, lithographies. 7 figs.

  11. Nanobiocatalyst advancements and bioprocessing applications.

    PubMed

    Misson, Mailin; Zhang, Hu; Jin, Bo

    2015-01-06

    The nanobiocatalyst (NBC) is an emerging innovation that synergistically integrates advanced nanotechnology with biotechnology and promises exciting advantages for improving enzyme activity, stability, capability and engineering performances in bioprocessing applications. NBCs are fabricated by immobilizing enzymes with functional nanomaterials as enzyme carriers or containers. In this paper, we review the recent developments of novel nanocarriers/nanocontainers with advanced hierarchical porous structures for retaining enzymes, such as nanofibres (NFs), mesoporous nanocarriers and nanocages. Strategies for immobilizing enzymes onto nanocarriers made from polymers, silicas, carbons and metals by physical adsorption, covalent binding, cross-linking or specific ligand spacers are discussed. The resulting NBCs are critically evaluated in terms of their bioprocessing performances. Excellent performances are demonstrated through enhanced NBC catalytic activity and stability due to conformational changes upon immobilization and localized nanoenvironments, and NBC reutilization by assembling magnetic nanoparticles into NBCs to defray the high operational costs associated with enzyme production and nanocarrier synthesis. We also highlight several challenges associated with the NBC-driven bioprocess applications, including the maturation of large-scale nanocarrier synthesis, design and development of bioreactors to accommodate NBCs, and long-term operations of NBCs. We suggest these challenges are to be addressed through joint collaboration of chemists, engineers and material scientists. Finally, we have demonstrated the great potential of NBCs in manufacturing bioprocesses in the near future through successful laboratory trials of NBCs in carbohydrate hydrolysis, biofuel production and biotransformation.

  12. Nanobiocatalyst advancements and bioprocessing applications

    PubMed Central

    Misson, Mailin; Zhang, Hu; Jin, Bo

    2015-01-01

    The nanobiocatalyst (NBC) is an emerging innovation that synergistically integrates advanced nanotechnology with biotechnology and promises exciting advantages for improving enzyme activity, stability, capability and engineering performances in bioprocessing applications. NBCs are fabricated by immobilizing enzymes with functional nanomaterials as enzyme carriers or containers. In this paper, we review the recent developments of novel nanocarriers/nanocontainers with advanced hierarchical porous structures for retaining enzymes, such as nanofibres (NFs), mesoporous nanocarriers and nanocages. Strategies for immobilizing enzymes onto nanocarriers made from polymers, silicas, carbons and metals by physical adsorption, covalent binding, cross-linking or specific ligand spacers are discussed. The resulting NBCs are critically evaluated in terms of their bioprocessing performances. Excellent performances are demonstrated through enhanced NBC catalytic activity and stability due to conformational changes upon immobilization and localized nanoenvironments, and NBC reutilization by assembling magnetic nanoparticles into NBCs to defray the high operational costs associated with enzyme production and nanocarrier synthesis. We also highlight several challenges associated with the NBC-driven bioprocess applications, including the maturation of large-scale nanocarrier synthesis, design and development of bioreactors to accommodate NBCs, and long-term operations of NBCs. We suggest these challenges are to be addressed through joint collaboration of chemists, engineers and material scientists. Finally, we have demonstrated the great potential of NBCs in manufacturing bioprocesses in the near future through successful laboratory trials of NBCs in carbohydrate hydrolysis, biofuel production and biotransformation. PMID:25392397

  13. Direct write lithography: the global solution for R&D and manufacturing

    NASA Astrophysics Data System (ADS)

    Pain, Laurent; Tedesco, Serge; Constancias, Christophe

    2006-10-01

    The electron beam lithography is a well known and mature solution, widely installed in research laboratories and Universities, to provide advanced patterning for research and development programs for a large field of applications. However, limited by its low throughput capabilities, the direct write solution never appeared as a credible option for manufacturing purposes. Nevertheless, semiconductor business starts to be affected by the increasing cost of the optical lithography requesting more and more complex masks and projection systems. This trend opens opportunities for high throughput mask less equipments to address ASIC manufacturing. A review of the Maskless Lithography (ML2) technology is presented in this article, including process integration capability, application fields and perspective for high throughput ML2 solution. To cite this article: L. Pain et al., C. R. Physique 7 (2006).

  14. A computational technique to optimally design in-situ diffractive elements: applications to projection lithography at the resist resolution limit

    NASA Astrophysics Data System (ADS)

    Feijóo, Gonzalo R.; Tirapu-Azpiroz, Jaione; Rosenbluth, Alan E.; Oberai, Assad A.; Jagalur Mohan, Jayanth; Tian, Kehan; Melville, David; Gil, Dario; Lai, Kafai

    2009-03-01

    Near-field interference lithography is a promising variant of multiple patterning in semiconductor device fabrication that can potentially extend lithographic resolution beyond the current materials-based restrictions on the Rayleigh resolution of projection systems. With H2O as the immersion medium, non-evanescent propagation and optical design margins limit achievable pitch to approximately 0.53λ/nH2O = 0.37λ. Non-evanescent images are constrained only by the comparatively large resist indices (typically1.7) to a pitch resolution of 0.5/nresist (typically 0.29). Near-field patterning can potentially exploit evanescent waves and thus achieve higher spatial resolutions. Customized near-field images can be achieved through the modulation of an incoming wavefront by what is essentially an in-situ hologram that has been formed in an upper layer during an initial patterned exposure. Contrast Enhancement Layer (CEL) techniques and Talbot near-field interferometry can be considered special cases of this approach. Since the technique relies on near-field interference effects to produce the required pattern on the resist, the shape of the grating and the design of the film stack play a significant role on the outcome. As a result, it is necessary to resort to full diffraction computations to properly simulate and optimize this process. The next logical advance for this technology is to systematically design the hologram and the incident wavefront which is generated from a reduction mask. This task is naturally posed as an optimization problem, where the goal is to find the set of geometric and incident wavefront parameters that yields the closest fit to a desired pattern in the resist. As the pattern becomes more complex, the number of design parameters grows, and the computational problem becomes intractable (particularly in three-dimensions) without the use of advanced numerical techniques. To treat this problem effectively, specialized numerical methods have been

  15. Advances and Applications for Geodesy

    NASA Astrophysics Data System (ADS)

    Calais, Eric; Schwartz, Susan; Arrowsmith, Ramon

    2010-07-01

    2010 UNAVCO Science Workshop; Boulder, Colorado, 8-11 March 2010; Geodesy's reach has expanded rapidly in recent years as EarthScope and international data sets have grown and new disciplinary applications have emerged. To explore advances in geodesy and its applications in geoscience research and education, approximately 170 scientists (representing 11 countries: Colombia, Denmark, Ecuador, France, Japan, Lebanon, Mexico, New Zealand, Russia, Spain, and the United States), including 15 students, gathered at the 2010 UNAVCO Science Workshop in Colorado. UNAVCO is a nonprofit membership-governed consortium that facilitates geoscience research and education using geodesy. Plenary sessions integrated discovery with broad impact and viewed geodesy through three lenses: (1) pixel-by-pixel geodetic imaging where various remote sensing methodologies are revealing fine-scale changes in the near-surface environment and the geologic processes responsible for them; (2) epoch-by-epoch deformation time series measured in seconds to millennia, which are uncovering ephemeral processes associated with the earthquake cycle and glacial and groundwater flow; and (3) emerging observational powers from advancing geodetic technologies. A fourth plenary session dealt with geodesy and water, a new strategic focus on the hydrosphere, cryosphere, and changing climate. Keynotes included a historical perspective by Bernard Minster (Scripps Institution of Oceanography) on space geodesy and its applications to geophysics, and a summary talk by Susan Eriksson (UNAVCO) on the successes of Research Experience in Solid Earth Science for Students (RESESS) and its 5-year follow-on with opportunities to mentor the next generation of geoscientists through cultivation of diversity.

  16. Advanced textile applications for primary aircraft structures

    NASA Technical Reports Server (NTRS)

    Jackson, Anthony C.; Barrie, Ronald E.; Shah, Bharat M.; Shukla, Jay G.

    1992-01-01

    Advanced composite primary structural concepts were evaluated for low cost, damage tolerant structures. Development of advanced textile preforms for fuselage structural applications with resin transfer molding and powder epoxy materials are now under development.

  17. Advanced textile applications for primary aircraft structures

    NASA Technical Reports Server (NTRS)

    Jackson, Anthony C.; Barrie, Ronald E.; Shah, Bharat M.; Shukla, Jay G.

    1992-01-01

    Advanced composite primary structural concepts have been evaluated for low cost, damage tolerant structures. Development of advanced textile preforms for fuselage structural applications with resin transfer molding and powder epoxy material is now under development.

  18. Nanostructured surfaces using thermal nanoimprint lithography: Applications in thin membrane technology, piezoelectric energy harvesting and tactile pressure sensing

    NASA Astrophysics Data System (ADS)

    Nabar, Bhargav Pradip

    Nanoimprint lithography (NIL) is emerging as a viable contender for fabrication of large-scale arrays of 5-500 nm features. The work presented in this dissertation aims to leverage the advantages of NIL for realization of novel Nano Electro Mechanical Systems (NEMS). The first application is a nanoporous membrane blood oxygenator system. A fabrication process for realization of thin nanoporous membranes using thermal nanoimprint lithography is presented. Suspended silicon nitride membranes were fabricated by Low-Pressure Chemical Vapor Deposition (LPCVD) in conjunction with a potassium hydroxide-based bulk micromachining process. Nanoscale features were imprinted into a commercially available thermoplastic polymer resist using a pre-fabricated silicon mold. The pattern was reversed and transferred to a thin aluminum oxide layer by means of a novel two stage lift-off technique. The patterned aluminum oxide was used as an etch mask in a CHF3/He based reactive ion etch process to transfer the pattern to silicon nitride. Highly directional etch profiles with near vertical sidewalls and excellent Si3N4/Al2O3 etch selectivity was observed. One-micrometer-thick porous membranes with varying dimensions of 250x250 microm2 to 450x450 microm 2 and pore diameter of 400 nm have been engineered and evaluated. Results indicate that the membranes have consistent nanopore dimensions and precisely defined porosity, which makes them ideal as gas exchange interfaces in blood oxygenation systems as well as other applications such as dialysis. Additionally, bulk -- micromachined microfluidic channels have been developed for uniform, laminar blood flow with minimal cell trauma. NIL has been used for ordered growth of crystalline nanostructures for sensing and energy harvesting. Highly ordered arrays of crystalline ZnO nanorods have been fabricated using a polymer template patterned by thermal nanoimprint lithography, in conjunction with a low temperature hydrothermal growth process. Zinc

  19. Advanced fuel concepts and applications

    SciTech Connect

    Miley, G.H.

    1981-01-01

    Despite their more stringent plasma heating and confinement requirements, advanced fuel (AF) fusion cycles potentially offer improved environmental compatibility and lower costs. This comes about by elimination of tritium breeding requirements and by a reduction in neutron flux (hence, activation and radiation damage). Also a larger energy fraction carried by charged particles makes direct energy conversion more suitable. As a first application, a symbiotic system of semi-catalyzed-deuterium fueled hybrid fuel factories, supplying both fissle fuel to light water reactors and /sup 3/He to D-/sup 3/He satellite fusion reactors, is proposed. Subsequently, an evolution into a system of synfuel factories with satellite D-/sup 3/He reactors is envisioned.

  20. High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field.

    PubMed

    Wen, X; Datta, A; Traverso, L M; Pan, L; Xu, X; Moon, E E

    2015-11-03

    Optical lithography, the enabling process for defining features, has been widely used in semiconductor industry and many other nanotechnology applications. Advances of nanotechnology require developments of high-throughput optical lithography capabilities to overcome the optical diffraction limit and meet the ever-decreasing device dimensions. We report our recent experimental advancements to scale up diffraction unlimited optical lithography in a massive scale using the near field nanolithography capabilities of bowtie apertures. A record number of near-field optical elements, an array of 1,024 bowtie antenna apertures, are simultaneously employed to generate a large number of patterns by carefully controlling their working distances over the entire array using an optical gap metrology system. Our experimental results reiterated the ability of using massively-parallel near-field devices to achieve high-throughput optical nanolithography, which can be promising for many important nanotechnology applications such as computation, data storage, communication, and energy.

  1. Progress in coherent lithography using table-top extreme ultraviolet lasers

    NASA Astrophysics Data System (ADS)

    Li, Wei

    Nanotechnology has drawn a wide variety of attention as interesting phenomena occurs when the dimension of the structures is in the nanometer scale. The particular characteristics of nanoscale structures had enabled new applications in different fields in science and technology. Our capability to fabricate these nanostructures routinely for sure will impact the advancement of nanoscience. Apart from the high volume manufacturing in semiconductor industry, a small-scale but reliable nanofabrication tool can dramatically help the research in the field of nanotechnology. This dissertation describes alternative extreme ultraviolet (EUV) lithography techniques which combine table-top EUV laser and various cost-effective imaging strategies. For each technique, numerical simulations, system design, experiment result and its analysis will be presented. In chapter II, a brief review of the main characteristics of table-top EUV lasers will be addressed concentrating on its high power and large coherence radius that enable the lithography application described herein. The development of a Talbot EUV lithography system which is capable of printing 50nm half pitch nanopatterns will be illustrated in chapter III. A detailed discussion of its resolution limit will be presented followed by the development of X-Y-Z positioning stage, the fabrication protocol for diffractive EUV mask, and the pattern transfer using self- developed ion beam etching, and the dose control unit. In addition, this dissertation demonstrated the capability to fabricate functional periodic nanostructures using Talbot EUV lithography. After that, resolution enhancement techniques like multiple exposure, displacement Talbot EUV lithography, fractional Talbot EUV lithography, and Talbot lithography using 18.9nm amplified spontaneous emission laser will be demonstrated. Chapter IV will describe a hybrid EUV lithography which combines the Talbot imaging and interference lithography rendering a high resolution

  2. Combined dose and geometry correction (DMG) for low energy multi electron beam lithography (5kV): application to the 16nm node

    NASA Astrophysics Data System (ADS)

    Martin, Luc; Manakli, Serdar; Bayle, Sebastien; Belledent, Jérôme; Soulan, Sebastien; Wiedemann, Pablo; Farah, Abdi; Schiavone, Patrick

    2012-03-01

    Lithography faces today many challenges to meet the ITRS road-map. 193nm is still today the only existing industrial option to address high volume production for the 22nm node. Nevertheless to achieve such a resolution, double exposure is mandatory for critical level patterning. EUV lithography is still challenged by the availability of high power source and mask defectivity and suffers from a high cost of ownership perspective. Its introduction is now not foreseen before 2015. Parallel to these mask-based technologies, maskless lithography regularly makes significant progress in terms of potential and maturity. The massively parallel e-beam solution appears as a real candidate for high volume manufacturing. Several industrial projects are under development, one in the US, with the KLA REBL project and two in Europe driven by IMS Nanofabrication (Austria; MAPPER (The Netherlands). Among the developments to be performed to secure the takeoff of the multi-beam technology, the availability of a rapid and robust data treatment solution will be one of the major challenges. Within this data preparation flow, advanced proximity effect corrections must be implemented to address the 16nm node and below. This paper will detail this process and compare correction strategies in terms of robustness and accuracy. It will be based on results obtained using a MAPPER tool within the IMAGINE program driven by CEA-LETI, in Grenoble, France. All proximity effects corrections and the dithering step were performed using the software platform Inscale® from Aselta Nanographics. One important advantage of Inscale® is the ability to combine both model based dose and geometry adjustment to accurately pattern critical features. The paper will focus on the advantage of combining those two corrections at the 16nm node instead of using only geometry corrections. Thanks to the simulation capability of Inscale®, pattern fidelity and correction robustness will be evaluated and compared between

  3. Multiplex lithography for multilevel multiscale architectures and its application to polymer electrolyte membrane fuel cell

    PubMed Central

    Cho, Hyesung; Moon Kim, Sang; Sik Kang, Yun; Kim, Junsoo; Jang, Segeun; Kim, Minhyoung; Park, Hyunchul; Won Bang, Jung; Seo, Soonmin; Suh, Kahp-Yang; Sung, Yung-Eun; Choi, Mansoo

    2015-01-01

    The production of multiscale architectures is of significant interest in materials science, and the integration of those structures could provide a breakthrough for various applications. Here we report a simple yet versatile strategy that allows for the LEGO-like integrations of microscale membranes by quantitatively controlling the oxygen inhibition effects of ultraviolet-curable materials, leading to multilevel multiscale architectures. The spatial control of oxygen concentration induces different curing contrasts in a resin allowing the selective imprinting and bonding at different sides of a membrane, which enables LEGO-like integration together with the multiscale pattern formation. Utilizing the method, the multilevel multiscale Nafion membranes are prepared and applied to polymer electrolyte membrane fuel cell. Our multiscale membrane fuel cell demonstrates significant enhancement of performance while ensuring mechanical robustness. The performance enhancement is caused by the combined effect of the decrease of membrane resistance and the increase of the electrochemical active surface area. PMID:26412619

  4. 16 nm-resolution lithography using ultra-small-gap bowtie apertures

    NASA Astrophysics Data System (ADS)

    Chen, Yang; Qin, Jin; Chen, Jianfeng; Zhang, Liang; Ma, Chengfu; Chu, Jiaru; Xu, Xianfan; Wang, Liang

    2017-02-01

    Photolithography has long been a critical technology for nanoscale manufacturing, especially in the semiconductor industry. However, the diffractive nature of light has limited the continuous advance of optical lithography resolution. To overcome this obstacle, near-field scanning optical lithography (NSOL) is an alternative low-cost technique, whose resolution is determined by the near-field localization that can be achieved. Here, we apply the newly-developed backside milling method to fabricate bowtie apertures with a sub-15 nm gap, which can substantially improve the resolution of NSOL. A highly confined electric near field is produced by localized surface plasmon excitation and nanofocusing of the closely-tapered gap. We show contact lithography results with a record 16 nm resolution (FWHM). This photolithography scheme promises potential applications in data storage, high-speed computation, energy harvesting, and other nanotechnology areas.

  5. 16 nm-resolution lithography using ultra-small-gap bowtie apertures.

    PubMed

    Chen, Yang; Qin, Jin; Chen, Jianfeng; Zhang, Liang; Ma, Chengfu; Chu, Jiaru; Xu, Xianfan; Wang, Liang

    2017-02-03

    Photolithography has long been a critical technology for nanoscale manufacturing, especially in the semiconductor industry. However, the diffractive nature of light has limited the continuous advance of optical lithography resolution. To overcome this obstacle, near-field scanning optical lithography (NSOL) is an alternative low-cost technique, whose resolution is determined by the near-field localization that can be achieved. Here, we apply the newly-developed backside milling method to fabricate bowtie apertures with a sub-15 nm gap, which can substantially improve the resolution of NSOL.  A highly confined electric near field is produced by localized surface plasmon excitation and nanofocusing of the closely-tapered gap. We show contact lithography results with a record 16 nm resolution (FWHM). This photolithography scheme promises potential applications in data storage, high-speed computation, energy harvesting, and other nanotechnology areas.

  6. Advanced Materials for Space Applications

    NASA Technical Reports Server (NTRS)

    Pater, Ruth H.; Curto, Paul A.

    2005-01-01

    Since NASA was created in 1958, over 6400 patents have been issued to the agency--nearly one in a thousand of all patents ever issued in the United States. A large number of these inventions have focused on new materials that have made space travel and exploration of the moon, Mars, and the outer planets possible. In the last few years, the materials developed by NASA Langley Research Center embody breakthroughs in performance and properties that will enable great achievements in space. The examples discussed below offer significant advantages for use in small satellites, i.e., those with payloads under a metric ton. These include patented products such as LaRC SI, LaRC RP 46, LaRC RP 50, PETI-5, TEEK, PETI-330, LaRC CP, TOR-LM and LaRC LCR (patent pending). These and other new advances in nanotechnology engineering, self-assembling nanostructures and multifunctional aerospace materials are presented and discussed below, and applications with significant technological and commercial advantages are proposed.

  7. Advanced materials for space applications

    NASA Astrophysics Data System (ADS)

    Pater, Ruth H.; Curto, Paul A.

    2007-12-01

    Since NASA was created in 1958, over 6400 patents have been issued to the agency—nearly one in a thousand of all patents ever issued in the United States. A large number of these inventions have focused on new materials that have made space travel and exploration of the moon, Mars, and the outer planets possible. In the last few years, the materials developed by NASA Langley Research Center embody breakthroughs in performance and properties that will enable great achievements in space. The examples discussed below offer significant advantages for use in small satellites, i.e., those with payloads under a metric ton. These include patented products such as LaRC SI, LaRC RP 46, LaRC RP 50, PETI-5, TEEK, PETI-330, LaRC CP, TOR-LM and LaRC LCR (patent pending). These and other new advances in nanotechnology engineering, self-assembling nanostructures and multifunctional aerospace materials are presented and discussed below, and applications with significant technological and commercial advantages are proposed.

  8. 450mm wafer patterning with jet and flash imprint lithography

    NASA Astrophysics Data System (ADS)

    Thompson, Ecron; Hellebrekers, Paul; Hofemann, Paul; LaBrake, Dwayne L.; Resnick, Douglas J.; Sreenivasan, S. V.

    2013-09-01

    The next step in the evolution of wafer size is 450mm. Any transition in sizing is an enormous task that must account for fabrication space, environmental health and safety concerns, wafer standards, metrology capability, individual process module development and device integration. For 450mm, an aggressive goal of 2018 has been set, with pilot line operation as early as 2016. To address these goals, consortiums have been formed to establish the infrastructure necessary to the transition, with a focus on the development of both process and metrology tools. Central to any process module development, which includes deposition, etch and chemical mechanical polishing is the lithography tool. In order to address the need for early learning and advance process module development, Molecular Imprints Inc. has provided the industry with the first advanced lithography platform, the Imprio® 450, capable of patterning a full 450mm wafer. The Imprio 450 was accepted by Intel at the end of 2012 and is now being used to support the 450mm wafer process development demands as part of a multi-year wafer services contract to facilitate the semiconductor industry's transition to lower cost 450mm wafer production. The Imprio 450 uses a Jet and Flash Imprint Lithography (J-FILTM) process that employs drop dispensing of UV curable resists to assist high resolution patterning for subsequent dry etch pattern transfer. The technology is actively being used to develop solutions for markets including NAND Flash memory, patterned media for hard disk drives and displays. This paper reviews the recent performance of the J-FIL technology (including overlay, throughput and defectivity), mask development improvements provided by Dai Nippon Printing, and the application of the technology to a 450mm lithography platform.

  9. Overlay distortions in wafer-scale integration lithography

    NASA Astrophysics Data System (ADS)

    Flack, Warren W.

    1993-08-01

    Wafer scale integration (WSI) lithography is the technique used to fabricate ultra large scale integration (ULSI) integrated circuits significantly greater in size than current products. Applications for WSI lithography include large solid state detector arrays, large area liquid crystal displays, high speed mainframe supercomputers, and large random access memories. The lithography technology required to manufacture these devices is particularly challenging, requiring stringent control of both submicron critical dimensions and accurate alignment of level to level device patterns over large chip areas.

  10. Decal transfer lithography

    NASA Astrophysics Data System (ADS)

    Childs, William Robert

    A new soft-lithographic method for micropatterning polymeric resists, Decal Transfer Lithography (DTL), is described. This technique is based on the adhesive transfer of elastomeric decal patterns via the engineered adhesion and release properties of a compliant poly(dimethylsiloxane) (PDMS) patterning tool. This procedure is capable of transferring micron to sub-micron-sized features with high fidelity over large substrate areas in both open and closed forms, negative and positive image contrasts. Methods are introduced to promote adhesion of PDMS to noble metals using either of two methods: self-assembling monolayers (SAMs) or silicon dioxide capping layers. A novel UV/Ozone (UVO) mask was developed, which allows the photopatterning of UVO modifications of polymer surfaces. This modification in turn enables the direct photoinitiated patterning of resist patterns transferred by the soft-lithographic DTL method Photodefined-Cohesive Mechanical Failure (P-CMF), which fuses the design rules of the contact based adhesive transfer of PDMS in DTL with those of photolithography. The second, so-called Spartacus method, transfers the design rules of photolithography directly onto PDMS surfaces, enabling a photodefined adhesive transfer of PDMS films onto silicon oxide surfaces. The most significant advance embodied in the DTL method, however, is that is offers useful new capabilities for the design and fabrication of patterns of non-planar surfaces, 3D microfluidic assemblies, and microreactors.

  11. Controlled Scanning Probe Lithography

    NASA Astrophysics Data System (ADS)

    Ruskell, Todd G.; Sarid, Dror; Workman, Richard K.; Pyle, Jason L.

    1997-03-01

    A method for real-time monitoring of the quality and quantity of silicon oxide grown on silicon using conducting-tip scanning probe lithography has been developed. The sub-picoampere tip-sample currents measured during lithography in ambient conditions are shown to be proportional to the amount of silicon oxide being grown. In addition, we have demonstrated the ability to control the composition of the grown material by altering the lithographic environment. Silicon nitride growth is shown to result from lithography on silicon samples in an environment of annhydrous ammonia.

  12. Multi-shaped beam: development status and update on lithography results

    NASA Astrophysics Data System (ADS)

    Slodowski, Matthias; Doering, Hans-Joachim; Dorl, Wolfgang; Stolberg, Ines A.

    2011-04-01

    According to the ITRS [1] photo mask is a significant challenge for the 22nm technology node requirements and beyond. Mask making capability and cost escalation continue to be critical for future lithography progress. On the technological side mask specifications and complexity have increased more quickly than the half-pitch requirements on the wafer designated by the roadmap due to advanced optical proximity correction and double patterning demands. From the economical perspective mask costs have significantly increased each generation, in which mask writing represents a major portion. The availability of a multi-electron-beam lithography system for mask write application is considered a potential solution to overcome these challenges [2, 3]. In this paper an update of the development status of a full-package high-throughput multi electron-beam writer, called Multi Shaped Beam (MSB), will be presented. Lithography performance results, which are most relevant for mask writing applications, will be disclosed. The MSB technology is an evolutionary development of the matured single Variable Shaped Beam (VSB) technology. An arrangement of Multi Deflection Arrays (MDA) allows operation with multiple shaped beams of variable size, which can be deflected and controlled individually [4]. This evolutionary MSB approach is associated with a lower level of risk and a relatively short time to implementation compared to the known revolutionary concepts [3, 5, 6]. Lithography performance is demonstrated through exposed pattern. Further details of the substrate positioning platform performance will be disclosed. It will become apparent that the MSB operational mode enables lithography on the same and higher performance level compared to single VSB and that there are no specific additional lithography challenges existing beside those which have already been addressed [1].

  13. Application of advanced materials to rotating machines

    NASA Technical Reports Server (NTRS)

    Triner, J. E.

    1983-01-01

    In discussing the application of advanced materials to rotating machinery, the following topics are covered: the torque speed characteristics of ac and dc machines, motor and transformer losses, the factors affecting core loss in motors, advanced magnetic materials and conductors, and design tradeoffs for samarium cobalt motors.

  14. Aerospace applications of advanced aluminum alloys

    NASA Technical Reports Server (NTRS)

    Chellman, D. J.; Langenbeck, S. L.

    1993-01-01

    Advanced metallic materials within the Al-base family are being developed for applications on current and future aerospace vehicles. These advanced materials offer significant improvements in density, strength, stiffness, fracture resistance, and/or higher use temperature which translates into improved vehicle performance. Aerospace applications of advanced metallic materials include space structures, fighters, military and commercial transport aircraft, and missiles. Structural design requirements, including not only static and durability/damage tolerance criteria but also environmental considerations, drive material selections. Often trade-offs must be made regarding strength, fracture resistance, cost, reliability, and maintainability in order to select the optimum material for a specific application. These trade studies not only include various metallic materials but also many times include advanced composite materials. Details of material comparisons, aerospace applications, and material trades will be presented.

  15. Echelle grating for silicon photonics applications: integration of electron beam lithography in the process flow and first results

    NASA Astrophysics Data System (ADS)

    Kaschel, Mathias; Letzkus, Florian; Butschke, Jörg; Skwierawski, Piotr; Schneider, Marc; Weber, Marc

    2016-05-01

    We present the technology steps to integrate an Echelle grating in the process flow of silicon-organic hybrid (SOH) modulators or related active devices. The CMOS-compatible process flow on SOI substrates uses a mix of optical i-line lithography and electron beam lithography (EBL). High speed optical data communication depends on wavelength divisions multiplexing and de-multiplexing devices like Echelle gratings. The minimum feature sizes vary from device to device and reach down to 60 nm inside a modulator, while the total area of a single Echelle grating is up to several mm2 of unprocessed silicon. Resist patterning using a variable shape beam electron beam pattern generator allows high resolution. An oxide hard mask is deposited, patterns are structured threefold by EBL and are later transferred to the silicon. We demonstrate a 9-channel multiplexer featuring a 2 dB on-chip loss and an adjacent channel crosstalk better than -22 dB. Additionally a 45-channel Echelle multiplexer is presented with 5 dB on chip loss and a channel crosstalk better than -12 dB. The devices cover an on-chip area of only 0.08 mm2 and 0.5 mm2 with a wavelength spacing of 10.5 nm and 2.0 nm, respectively.

  16. Performance of a 1.35NA ArF immersion lithography system for 40-nm applications

    NASA Astrophysics Data System (ADS)

    de Klerk, Jos; Wagner, Christian; Droste, Richard; Levasier, Leon; Jorritsma, Louis; van Setten, Eelco; Kattouw, Hans; Jacobs, Jowan; Heil, Tilmann

    2007-03-01

    Water based immersion lithography is now widely recognized a key enabler for continued device shrinks beyond the limits of classical dry lithography. Since 2004, ASML has shipped multiple TWINSCAN immersion systems to IC manufacturers, which have facilitated immersion process integration and optimization. In early 2006, ASML commenced shipment of the first immersion systems for 45nm volume production, featuring an innovative in-line catadioptric lens with a numerical aperture (NA) of 1.2 and a high transmission polarized illumination system. A natural extension of this technology, the XT:1900Gi supports the continued drive for device shrinks that the semiconductor industry demands by offering 40nm half-pitch resolution. This tool features a projection lens based on the already proven in-line catadioptric lens concept but with an enhanced, industry leading NA of 1.35. In this paper, we will discuss the immersion technology challenges and solutions, and present performance data for this latest dual wafer stage TWINSCAN immersion system.

  17. Force-controlled inorganic crystallization lithography.

    PubMed

    Cheng, Chao-Min; LeDuc, Philip R

    2006-09-20

    Lithography plays a key role in integrated circuits, optics, information technology, biomedical applications, catalysis, and separation technologies. However, inorganic lithography techniques remain of limited utility for applications outside of the typical foci of integrated circuit manufacturing. In this communication, we have developed a novel stamping method that applies pressure on the upper surface of the stamp to regulate the dewetting process of the inorganic buffer and the evaporation rate of the solvent in this buffer between the substrate and the surface of the stamp. We focused on generating inorganic microstructures with specific locations and also on enabling the ability to pattern gradients during the crystallization of the inorganic salts. This approach utilized a combination of lithography with bottom-up growth and assembly of inorganic crystals. This work has potential applications in a variety of fields, including studying inorganic material patterning and small-scale fabrication technology.

  18. NAS Applications and Advanced Algorithms

    NASA Technical Reports Server (NTRS)

    Bailey, David H.; Biswas, Rupak; VanDerWijngaart, Rob; Kutler, Paul (Technical Monitor)

    1997-01-01

    This paper examines the applications most commonly run on the supercomputers at the Numerical Aerospace Simulation (NAS) facility. It analyzes the extent to which such applications are fundamentally oriented to vector computers, and whether or not they can be efficiently implemented on hierarchical memory machines, such as systems with cache memories and highly parallel, distributed memory systems.

  19. Deep X-Ray Lithography Based Fabrication of Rare-Earth Based Permanent Magnets and their Applications to Microactuators

    SciTech Connect

    Christenson, T.R.; Garino, T.J.; Venturini, E.L.

    1999-01-27

    Precision high aspect-ratio micro molds constructed by deep x-ray lithography have been used to batch fabricate accurately shaped bonded rare-earth based permanent magnets with features as small as 5 microns and thicknesses up to 500 microns. Maximum energy products of up to 8 MGOe have been achieved with a 20%/vol. epoxy bonded melt-spun isotropic Nd2Fe14b powder composite. Using individually processed sub- millimeter permanent sections multipole rotors have been assembled. Despite the fact that these permanent magnet structures are small, their magnetic field producing capability remains the same as at any scale. Combining permanent magnet structures with soft magnetic materials and micro-coils makes possible new and more efficient magnetic microdevices.

  20. Lead zirconate titanate nanoscale patterning by ultraviolet-based lithography lift-off technique for nano-electromechanical system applications.

    PubMed

    Guillon, Samuel; Saya, Daisuke; Mazenq, Laurent; Costecalde, Jean; Rèmiens, Denis; Soyer, Caroline; Nicu, Liviu

    2012-09-01

    The advantage of using lead zirconate titanate (PbZr(0.54)Ti(0.46)O(3)) ceramics as an active material in nanoelectromechanical systems (NEMS) comes from its relatively high piezoelectric coefficients. However, its integration within a technological process is limited by the difficulty of structuring this material with submicrometer resolution at the wafer scale. In this work, we develop a specific patterning method based on optical lithography coupled with a dual-layer resist process. The main objective is to obtain sub-micrometer features by lifting off a 100-nm-thick PZT layer while preserving the material's piezoelectric properties. A subsequent result of the developed method is the ability to stack several layers with a lateral resolution of few tens of nanometers, which is mandatory for the fabrication of NEMS with integrated actuation and read-out capabilities.

  1. Maskless, resistless ion beam lithography

    SciTech Connect

    Ji, Qing

    2003-01-01

    As the dimensions of semiconductor devices are scaled down, in order to achieve higher levels of integration, optical lithography will no longer be sufficient for the needs of the semiconductor industry. Alternative next-generation lithography (NGL) approaches, such as extreme ultra-violet (EUV), X-ray, electron-beam, and ion projection lithography face some challenging issues with complicated mask technology and low throughput. Among the four major alternative NGL approaches, ion beam lithography is the only one that can provide both maskless and resistless patterning. As such, it can potentially make nano-fabrication much simpler. This thesis investigates a focused ion beam system for maskless, resistless patterning that can be made practical for high-volume production. In order to achieve maskless, resistless patterning, the ion source must be able to produce a variety of ion species. The compact FIB system being developed uses a multicusp plasma ion source, which can generate ion beams of various elements, such as O2+, BF2+, P+ etc., for surface modification and doping applications. With optimized source condition, around 85% of BF2+, over 90% of O2+ and P+ have been achieved. The brightness of the multicusp-plasma ion source is a key issue for its application to maskless ion beam lithography. It can be substantially improved by optimizing the source configuration and extractor geometry. Measured brightness of 2 keV He+ beam is as high as 440 A/cm2 • Sr, which represents a 30x improvement over prior work. Direct patterning of Si thin film using a focused O2+ ion beam has been investigated. A thin surface oxide film can be selectively formed using 3 keV O2+ ions with the dose of 1015 cm-2. The oxide can then serve as a hard mask for patterning of the Si film. The

  2. Nanoscale Advances in Catalysis and Energy Applications

    SciTech Connect

    Li, Yimin; Somorjai, Gabor A.

    2010-05-12

    In this perspective, we present an overview of nanoscience applications in catalysis, energy conversion, and energy conservation technologies. We discuss how novel physical and chemical properties of nanomaterials can be applied and engineered to meet the advanced material requirements in the new generation of chemical and energy conversion devices. We highlight some of the latest advances in these nanotechnologies and provide an outlook at the major challenges for further developments.

  3. Towards advanced OCT clinical applications

    NASA Astrophysics Data System (ADS)

    Kirillin, Mikhail; Panteleeva, Olga; Agrba, Pavel; Pasukhin, Mikhail; Sergeeva, Ekaterina; Plankina, Elena; Dudenkova, Varvara; Gubarkova, Ekaterina; Kiseleva, Elena; Gladkova, Natalia; Shakhova, Natalia; Vitkin, Alex

    2015-07-01

    In this paper we report on our recent achievement in application of conventional and cross-polarization OCT (CP OCT) modalities for in vivo clinical diagnostics in different medical areas including gynecology, dermatology, and stomatology. In gynecology, CP OCT was employed for diagnosing fallopian tubes and cervix; in dermatology OCT for monitoring of treatment of psoriasis, scleroderma and atopic dermatitis; and in stomatology for diagnosis of oral diseases. For all considered application, we propose and develop different image processing methods which enhance the diagnostic value of the technique. In particular, we use histogram analysis, Fourier analysis and neural networks, thus calculating different tissue characteristics as revealed by OCT's polarization evolution. These approaches enable improved OCT image quantification and increase its resultant diagnostic accuracy.

  4. Advances in DOE modeling and optical performance for SMO applications

    NASA Astrophysics Data System (ADS)

    Carriere, James; Stack, Jared; Childers, John; Welch, Kevin; Himel, Marc D.

    2010-04-01

    The introduction of source mask optimization (SMO) to the design process addresses an urgent need for the 32nm node and beyond as alternative lithography approaches continue to push out. To take full advantage of SMO routines, an understanding of the characteristic properties of diffractive optical elements (DOEs) is required. Greater flexibility in the DOE output is needed to optimize lithographic process windows. In addition, new and tighter constraints on the DOEs used for off-axis illumination (OAI) are being introduced to precisely predict, control and reduce the effects of pole imbalance and stray light on the CD budget. We present recent advancements in the modeling and optical performance of these DOEs.

  5. Data sharing system for lithography APC

    NASA Astrophysics Data System (ADS)

    Kawamura, Eiichi; Teranishi, Yoshiharu; Shimabara, Masanori

    2007-03-01

    We have developed a simple and cost-effective data sharing system between fabs for lithography advanced process control (APC). Lithography APC requires process flow, inter-layer information, history information, mask information and so on. So, inter-APC data sharing system has become necessary when lots are to be processed in multiple fabs (usually two fabs). The development cost and maintenance cost also have to be taken into account. The system handles minimum information necessary to make trend prediction for the lots. Three types of data have to be shared for precise trend prediction. First one is device information of the lots, e.g., process flow of the device and inter-layer information. Second one is mask information from mask suppliers, e.g., pattern characteristics and pattern widths. Last one is history data of the lots. Device information is electronic file and easy to handle. The electronic file is common between APCs and uploaded into the database. As for mask information sharing, mask information described in common format is obtained via Wide Area Network (WAN) from mask-vender will be stored in the mask-information data server. This information is periodically transferred to one specific lithography-APC server and compiled into the database. This lithography-APC server periodically delivers the mask-information to every other lithography-APC server. Process-history data sharing system mainly consists of function of delivering process-history data. In shipping production lots to another fab, the product-related process-history data is delivered by the lithography-APC server from the shipping site. We have confirmed the function and effectiveness of data sharing systems.

  6. Ion beam lithography system

    DOEpatents

    Leung, Ka-Ngo

    2005-08-02

    A maskless plasma-formed ion beam lithography tool provides for patterning of sub-50 nm features on large area flat or curved substrate surfaces. The system is very compact and does not require an accelerator column and electrostatic beam scanning components. The patterns are formed by switching beamlets on or off from a two electrode blanking system with the substrate being scanned mechanically in one dimension. This arrangement can provide a maskless nano-beam lithography tool for economic and high throughput processing.

  7. Signature molecular descriptor : advanced applications.

    SciTech Connect

    Visco, Donald Patrick, Jr.

    2010-04-01

    In this work we report on the development of the Signature Molecular Descriptor (or Signature) for use in the solution of inverse design problems as well as in highthroughput screening applications. The ultimate goal of using Signature is to identify novel and non-intuitive chemical structures with optimal predicted properties for a given application. We demonstrate this in three studies: green solvent design, glucocorticoid receptor ligand design and the design of inhibitors for Factor XIa. In many areas of engineering, compounds are designed and/or modified in incremental ways which rely upon heuristics or institutional knowledge. Often multiple experiments are performed and the optimal compound is identified in this brute-force fashion. Perhaps a traditional chemical scaffold is identified and movement of a substituent group around a ring constitutes the whole of the design process. Also notably, a chemical being evaluated in one area might demonstrate properties very attractive in another area and serendipity was the mechanism for solution. In contrast to such approaches, computer-aided molecular design (CAMD) looks to encompass both experimental and heuristic-based knowledge into a strategy that will design a molecule on a computer to meet a given target. Depending on the algorithm employed, the molecule which is designed might be quite novel (re: no CAS registration number) and/or non-intuitive relative to what is known about the problem at hand. While CAMD is a fairly recent strategy (dating to the early 1980s), it contains a variety of bottlenecks and limitations which have prevented the technique from garnering more attention in the academic, governmental and industrial institutions. A main reason for this is how the molecules are described in the computer. This step can control how models are developed for the properties of interest on a given problem as well as how to go from an output of the algorithm to an actual chemical structure. This report

  8. Survey of Advanced Applications Over ACTS

    NASA Technical Reports Server (NTRS)

    Bauer, Robert; McMasters, Paul

    2000-01-01

    The Advanced Communications Technology Satellite (ACTS) system provided a national testbed that enabled advanced applications to be tested and demonstrated over a live satellite link. Of the applications that used ACTS. some offered unique advantages over current methods, while others simply could not be accommodated by conventional systems. The initial technical and experiments results of the program were reported at the 1995 ACTS Results Conference. in Cleveland, Ohio. Since then, the Experiments Program has involved 45 new experiments comprising 30 application experiments and 15 technology related experiments that took advantage of the advanced technologies and unique capabilities offered by ACTS. The experiments are categorized and quantified to show the organizational mix of the experiments program and relative usage of the satellite. Since paper length guidelines preclude each experiment from being individually reported, the application experiments and significant demonstrations are surveyed to show the breadth of the activities that have been supported. Experiments in a similar application category are collectively discussed, such as. telemedicine. or networking and protocol evaluation. Where available. experiment conclusions and impact are presented and references of results and experiment information are provided. The quantity and diversity of the experiments program demonstrated a variety of service areas for the next generation of commercially available, advanced satellite communications.

  9. Lithography focus/exposure control and corrections to improve CDU at post etch step

    NASA Astrophysics Data System (ADS)

    Kim, Young Ki; Yelverton, Mark; Tristan, John; Lee, Joungchel; Gutjahr, Karsten; Hsu, Ching-Hsiang; Wei, Hong; Wang, Lester; Li, Chen; Subramany, Lokesh; Chung, Woong Jae; Kim, Jeong Soo; Ramanathan, Vidya; Yap, LipKong; Gao, Jie; Karur-Shanmugam, Ram; Golotsvan, Anna; Herrera, Pedro; Huang, Kevin; Pierson, Bill

    2014-04-01

    As leading edge lithography moves to advanced nodes in high-mix, high-volume manufacturing environment, automated control of critical dimension (CD) within wafer has become a requirement. Current control methods to improve CD uniformity (CDU) generally rely upon the use of field by field exposure corrections via factory automation or through scanner sub-recipe. Such CDU control methods are limited to lithography step and cannot be extended to etch step. In this paper, a new method to improve CDU at post etch step by optimizing exposure at lithography step is introduced. This new solution utilizes GLOBALFOUNDRIES' factory automation system and KLA-Tencor's K-T Analyzer as the infrastructure to calculate and feed the necessary field by field level exposure corrections back to scanner, so as to achieve the optimal CDU at post etch step. CD at post lithography and post etch steps are measured by scatterometry metrology tools respectively and are used by K-T Analyzer as the input for correction calculations. This paper will explain in detail the philosophy as well as the methodology behind this novel CDU control solution. In addition, applications and use cases will be reviewed to demonstrate the capability and potential of this solution. The feasibility of adopting this solution in high-mix, high-volume manufacturing environment will be discussed as well.

  10. Fabrication of gold-deposited plasmonic crystal based on nanoimprint lithography for label-free biosensing application

    NASA Astrophysics Data System (ADS)

    Nishiguchi, Kiichi; Sueyoshi, Kenji; Hisamoto, Hideaki; Endo, Tatsuro

    2016-08-01

    Here, we developed a highly sensitive label-free plasmonic crystal (PC). The PC is composed of two types of nanoperiodic metal structures, nanodiscs and nanohole arrays, fabricated simultaneously by nanoimprint lithography using a nanostructured polymer mold. The PC absorbed light at specific wavelengths based on localized surface plasmon resonance (LSPR). The strongly enhanced electric field was excited by the combined structures of nanodiscs and nanohole arrays; thus, highly sensitive biosensing was possible. The LSPR-based optical characteristics of the PC were analyzed by finite-difference time-domain simulation; the structure (metal layer thickness) was optimized to respond to changes in the surrounding refractive index with high sensitivity. PC-based biosensor chips were prepared by immobilizing anti-human immunoglobulin G, which was successfully detected in the 200 pg/mL to 200 ng/mL range. Our approach introduces an easy and rapid process allowing large-area fabrication of PCs, resulting in a highly sensitive label-free biosensor device.

  11. Advanced Ceramic Materials for Future Aerospace Applications

    NASA Technical Reports Server (NTRS)

    Misra, Ajay

    2015-01-01

    With growing trend toward higher temperature capabilities, lightweight, and multifunctionality, significant advances in ceramic matrix composites (CMCs) will be required for future aerospace applications. The presentation will provide an overview of material requirements for future aerospace missions, and the role of ceramics and CMCs in meeting those requirements. Aerospace applications will include gas turbine engines, aircraft structure, hypersonic and access to space vehicles, space power and propulsion, and space communication.

  12. Advanced Laboratory NMR Spectrometer with Applications.

    ERIC Educational Resources Information Center

    Biscegli, Clovis; And Others

    1982-01-01

    A description is given of an inexpensive nuclear magnetic resonance (NMR) spectrometer suitable for use in advanced laboratory courses. Applications to the nondestructive analysis of the oil content in corn seeds and in monitoring the crystallization of polymers are presented. (SK)

  13. Thirty years of lithography simulation

    NASA Astrophysics Data System (ADS)

    Mack, Chris A.

    2005-05-01

    Thirty years ago Rick Dill and his team at IBM published the first account of lithography simulation - the accurate description of semiconductor optical lithography by mathematical equations. Since then, lithography simulation has grown dramatically in importance in four important areas: as a research tool, as a development tool, as a manufacturing tool, and as a learning tool. In this paper, the history of lithography simulations is traced from its roots to today"s indispensable tools for lithographic technology development. Along the way, an attempt will be made to define the true value of lithography simulation to the semiconductor industry.

  14. An ice lithography instrument.

    PubMed

    Han, Anpan; Chervinsky, John; Branton, Daniel; Golovchenko, J A

    2011-06-01

    We describe the design of an instrument that can fully implement a new nanopatterning method called ice lithography, where ice is used as the resist. Water vapor is introduced into a scanning electron microscope (SEM) vacuum chamber above a sample cooled down to 110 K. The vapor condenses, covering the sample with an amorphous layer of ice. To form a lift-off mask, ice is removed by the SEM electron beam (e-beam) guided by an e-beam lithography system. Without breaking vacuum, the sample with the ice mask is then transferred into a metal deposition chamber where metals are deposited by sputtering. The cold sample is then unloaded from the vacuum system and immersed in isopropanol at room temperature. As the ice melts, metal deposited on the ice disperses while the metals deposited on the sample where the ice had been removed by the e-beam remains. The instrument combines a high beam-current thermal field emission SEM fitted with an e-beam lithography system, cryogenic systems, and a high vacuum metal deposition system in a design that optimizes ice lithography for high throughput nanodevice fabrication. The nanoscale capability of the instrument is demonstrated with the fabrication of nanoscale metal lines.

  15. An ice lithography instrument

    SciTech Connect

    Han, Anpan; Chervinsky, John; Branton, Daniel; Golovchenko, J. A.

    2011-06-15

    We describe the design of an instrument that can fully implement a new nanopatterning method called ice lithography, where ice is used as the resist. Water vapor is introduced into a scanning electron microscope (SEM) vacuum chamber above a sample cooled down to 110 K. The vapor condenses, covering the sample with an amorphous layer of ice. To form a lift-off mask, ice is removed by the SEM electron beam (e-beam) guided by an e-beam lithography system. Without breaking vacuum, the sample with the ice mask is then transferred into a metal deposition chamber where metals are deposited by sputtering. The cold sample is then unloaded from the vacuum system and immersed in isopropanol at room temperature. As the ice melts, metal deposited on the ice disperses while the metals deposited on the sample where the ice had been removed by the e-beam remains. The instrument combines a high beam-current thermal field emission SEM fitted with an e-beam lithography system, cryogenic systems, and a high vacuum metal deposition system in a design that optimizes ice lithography for high throughput nanodevice fabrication. The nanoscale capability of the instrument is demonstrated with the fabrication of nanoscale metal lines.

  16. Technology and application advancements of uncooled imagers

    NASA Astrophysics Data System (ADS)

    Norton, Peter W.; Kohin, Margaret

    2005-05-01

    Having delivered over 30,000 uncooled microbolometer based thermal imaging engines, BAE Systems is the world's leading producer. Advancements in technology include the demonstration of broadband microbolometers on a 46 μm pixel pitch which have excellent sensitivity in the MWIR (NETD ~180 mK, 3-5 μm) and LWIR (NETD ~ 15 mK, 8-12 μm) wavebands. Application advancements include the development of a family of thermal weapons sights for the military which will replace current cooled systems with lighter, lower power systems and the introduction of a new generation of handheld and pole mounted thermal imagers for commercial markets.

  17. Recent advances in vacuum sciences and applications

    NASA Astrophysics Data System (ADS)

    Mozetič, M.; Ostrikov, K.; Ruzic, D. N.; Curreli, D.; Cvelbar, U.; Vesel, A.; Primc, G.; Leisch, M.; Jousten, K.; Malyshev, O. B.; Hendricks, J. H.; Kövér, L.; Tagliaferro, A.; Conde, O.; Silvestre, A. J.; Giapintzakis, J.; Buljan, M.; Radić, N.; Dražić, G.; Bernstorff, S.; Biederman, H.; Kylián, O.; Hanuš, J.; Miloševič, S.; Galtayries, A.; Dietrich, P.; Unger, W.; Lehocky, M.; Sedlarik, V.; Stana-Kleinschek, K.; Drmota-Petrič, A.; Pireaux, J. J.; Rogers, J. W.; Anderle, M.

    2014-04-01

    Recent advances in vacuum sciences and applications are reviewed. Novel optical interferometer cavity devices enable pressure measurements with ppm accuracy. The innovative dynamic vacuum standard allows for pressure measurements with temporal resolution of 2 ms. Vacuum issues in the construction of huge ultra-high vacuum devices worldwide are reviewed. Recent advances in surface science and thin films include new phenomena observed in electron transport near solid surfaces as well as novel results on the properties of carbon nanomaterials. Precise techniques for surface and thin-film characterization have been applied in the conservation technology of cultural heritage objects and recent advances in the characterization of biointerfaces are presented. The combination of various vacuum and atmospheric-pressure techniques enables an insight into the complex phenomena of protein and other biomolecule conformations on solid surfaces. Studying these phenomena at solid-liquid interfaces is regarded as the main issue in the development of alternative techniques for drug delivery, tissue engineering and thus the development of innovative techniques for curing cancer and cardiovascular diseases. A review on recent advances in plasma medicine is presented as well as novel hypotheses on cell apoptosis upon treatment with gaseous plasma. Finally, recent advances in plasma nanoscience are illustrated with several examples and a roadmap for future activities is presented.

  18. Quantum memories: emerging applications and recent advances.

    PubMed

    Heshami, Khabat; England, Duncan G; Humphreys, Peter C; Bustard, Philip J; Acosta, Victor M; Nunn, Joshua; Sussman, Benjamin J

    2016-11-12

    Quantum light-matter interfaces are at the heart of photonic quantum technologies. Quantum memories for photons, where non-classical states of photons are mapped onto stationary matter states and preserved for subsequent retrieval, are technical realizations enabled by exquisite control over interactions between light and matter. The ability of quantum memories to synchronize probabilistic events makes them a key component in quantum repeaters and quantum computation based on linear optics. This critical feature has motivated many groups to dedicate theoretical and experimental research to develop quantum memory devices. In recent years, exciting new applications, and more advanced developments of quantum memories, have proliferated. In this review, we outline some of the emerging applications of quantum memories in optical signal processing, quantum computation and non-linear optics. We review recent experimental and theoretical developments, and their impacts on more advanced photonic quantum technologies based on quantum memories.

  19. Quantum memories: emerging applications and recent advances

    PubMed Central

    Heshami, Khabat; England, Duncan G.; Humphreys, Peter C.; Bustard, Philip J.; Acosta, Victor M.; Nunn, Joshua; Sussman, Benjamin J.

    2016-01-01

    Quantum light–matter interfaces are at the heart of photonic quantum technologies. Quantum memories for photons, where non-classical states of photons are mapped onto stationary matter states and preserved for subsequent retrieval, are technical realizations enabled by exquisite control over interactions between light and matter. The ability of quantum memories to synchronize probabilistic events makes them a key component in quantum repeaters and quantum computation based on linear optics. This critical feature has motivated many groups to dedicate theoretical and experimental research to develop quantum memory devices. In recent years, exciting new applications, and more advanced developments of quantum memories, have proliferated. In this review, we outline some of the emerging applications of quantum memories in optical signal processing, quantum computation and non-linear optics. We review recent experimental and theoretical developments, and their impacts on more advanced photonic quantum technologies based on quantum memories. PMID:27695198

  20. Quantum memories: emerging applications and recent advances

    NASA Astrophysics Data System (ADS)

    Heshami, Khabat; England, Duncan G.; Humphreys, Peter C.; Bustard, Philip J.; Acosta, Victor M.; Nunn, Joshua; Sussman, Benjamin J.

    2016-11-01

    Quantum light-matter interfaces are at the heart of photonic quantum technologies. Quantum memories for photons, where non-classical states of photons are mapped onto stationary matter states and preserved for subsequent retrieval, are technical realizations enabled by exquisite control over interactions between light and matter. The ability of quantum memories to synchronize probabilistic events makes them a key component in quantum repeaters and quantum computation based on linear optics. This critical feature has motivated many groups to dedicate theoretical and experimental research to develop quantum memory devices. In recent years, exciting new applications, and more advanced developments of quantum memories, have proliferated. In this review, we outline some of the emerging applications of quantum memories in optical signal processing, quantum computation and non-linear optics. We review recent experimental and theoretical developments, and their impacts on more advanced photonic quantum technologies based on quantum memories.

  1. Tutorial: Advanced fault tree applications using HARP

    NASA Technical Reports Server (NTRS)

    Dugan, Joanne Bechta; Bavuso, Salvatore J.; Boyd, Mark A.

    1993-01-01

    Reliability analysis of fault tolerant computer systems for critical applications is complicated by several factors. These modeling difficulties are discussed and dynamic fault tree modeling techniques for handling them are described and demonstrated. Several advanced fault tolerant computer systems are described, and fault tree models for their analysis are presented. HARP (Hybrid Automated Reliability Predictor) is a software package developed at Duke University and NASA Langley Research Center that is capable of solving the fault tree models presented.

  2. New Advanced Dielectric Materials for Accelerator Applications

    SciTech Connect

    Kanareykin, A.

    2010-11-04

    We present our recent results on the development and experimental testing of advanced dielectric materials that are capable of supporting the high RF electric fields generated by electron beams or pulsed high power microwaves. These materials have been optimized or specially designed for accelerator applications. The materials discussed here include low loss microwave ceramics, quartz, Chemical Vapor Deposition diamonds and nonlinear Barium Strontium Titanate based ferroelectrics.

  3. Environmental Applications of Biosurfactants: Recent Advances

    PubMed Central

    Pacwa-Płociniczak, Magdalena; Płaza, Grażyna A.; Piotrowska-Seget, Zofia; Cameotra, Swaranjit Singh

    2011-01-01

    Increasing public awareness of environmental pollution influences the search and development of technologies that help in clean up of organic and inorganic contaminants such as hydrocarbons and metals. An alternative and eco-friendly method of remediation technology of environments contaminated with these pollutants is the use of biosurfactants and biosurfactant-producing microorganisms. The diversity of biosurfactants makes them an attractive group of compounds for potential use in a wide variety of industrial and biotechnological applications. The purpose of this review is to provide a comprehensive overview of advances in the applications of biosurfactants and biosurfactant-producing microorganisms in hydrocarbon and metal remediation technologies. PMID:21340005

  4. Advanced Turbine Technology Applications Project (ATTAP)

    NASA Technical Reports Server (NTRS)

    1989-01-01

    Work to develop and demonstrate the technology of structural ceramics for automotive engines and similar applications is described. Long-range technology is being sought to produce gas turbine engines for automobiles with reduced fuel consumption and reduced environmental impact. The Advanced Turbine Technology Application Project (ATTAP) test bed engine is designed such that, when installed in a 3,000 pound inertia weight automobile, it will provide low emissions, 42 miles per gallon fuel economy on diesel fuel, multifuel capability, costs competitive with current spark ignition engines, and noise and safety characteristics that meet Federal standards.

  5. Environmental applications of biosurfactants: recent advances.

    PubMed

    Pacwa-Płociniczak, Magdalena; Płaza, Grażyna A; Piotrowska-Seget, Zofia; Cameotra, Swaranjit Singh

    2011-01-18

    Increasing public awareness of environmental pollution influences the search and development of technologies that help in clean up of organic and inorganic contaminants such as hydrocarbons and metals. An alternative and eco-friendly method of remediation technology of environments contaminated with these pollutants is the use of biosurfactants and biosurfactant-producing microorganisms. The diversity of biosurfactants makes them an attractive group of compounds for potential use in a wide variety of industrial and biotechnological applications. The purpose of this review is to provide a comprehensive overview of advances in the applications of biosurfactants and biosurfactant-producing microorganisms in hydrocarbon and metal remediation technologies.

  6. Communication services for advanced network applications.

    SciTech Connect

    Bresnahan, J.; Foster, I.; Insley, J.; Toonen, B.; Tuecke, S.

    1999-06-10

    Advanced network applications such as remote instrument control, collaborative environments, and remote I/O are distinguished by traditional applications such as videoconferencing by their need to create multiple, heterogeneous flows with different characteristics. For example, a single application may require remote I/O for raw datasets, shared controls for a collaborative analysis system, streaming video for image rendering data, and audio for collaboration. Furthermore, each flow can have different requirements in terms of reliability, network quality of service, security, etc. They argue that new approaches to communication services, protocols, and network architecture are required both to provide high-level abstractions for common flow types and to support user-level management of flow creation and quality. They describe experiences with the development of such applications and communication services.

  7. Simulations of immersion lithography

    NASA Astrophysics Data System (ADS)

    Bai, Min; Lei, Junjiang; Zhang, Lin; Shiely, James P.

    2005-05-01

    Immersion lithography has been regarded as the most viable contender to extend the resolution capability of optical lithography using 193nm wavelength. In parallel with the tremendous effort of overcoming the engineering challenges in immersion, support from modeling and simulations is strongly needed. Although immersion simulation has become available through a number of simulation tools, we need to investigate the model generation and its compatibility within the context of full-chip optical proximity correction (OPC). In this paper, we will describe the physics of a full vector model that is necessary for the high NA optical modeling under immersion. In this full vector model, we consider not only the plane wave decomposition as light travels from the mask to wafer plane, but also the refraction, transmission and reflection of light through a thin film stack on the wafer. We integrated this comprehensive vector model into Synopsys OPC modeling tool ProGen. Through ProGen simulation results, we will discuss several important merits of immersion lithography, as well as the full portability of immersion models into OPC process flow.

  8. Lithography focus/exposure control and corrections to improve CDU

    NASA Astrophysics Data System (ADS)

    Kim, Young Ki; Yelverton, Mark; Lee, Joungchel; Cheng, Jerry; Wei, Hong; Kim, Jeong Soo; Gutjahr, Karsten; Gao, Jie; Karur-Shanmugam, Ram; Herrera, Pedro; Huang, Kevin; Volkovich, Roie; Pierson, Bill

    2013-04-01

    As leading edge lithography moves to advanced nodes which requires better critical dimension (CD) control ability within wafer. Current methods generally make exposure corrections by field via factory automation or by sub-recipe to improve CD uniformity. KLA-Tencor has developed a method to provide CD uniformity (CDU) control using a generated Focus/Exposure (F/E) model from a representative process. Exposure corrections by each field can be applied back to the scanner so as to improve CD uniformity through the factory automation. CDU improvement can be observed either at after lithography or after etch metrology steps. In addition to corrections, the graphic K-T Analyzer interface also facilitates the focus/exposure monitoring at the extreme wafer edge. This paper will explain the KT CDFE method and the application in production environment. Run to run focus/exposure monitoring will be carried out both on monitoring and production wafers to control the wafer process and/or scanner fleet. CDU improvement opportunities will be considered as well.

  9. Evolution in the concentration of activities in lithography

    NASA Astrophysics Data System (ADS)

    Levinson, Harry J.

    2016-03-01

    From a perusal of the proceedings of the SPIE Advanced Lithography Symposium, the progression of new concepts in lithographic technology can be seen. A new idea first appears in a few papers, and over time, there is an increase in the number of papers on the same topic. Eventually the method becomes commonplace, and the number of papers on the topic declines, as the idea becomes part of our industry's working knowledge. For example, one or two papers on resolution enhancement techniques (RETs) appeared in the proceedings of the Optical Microlithography Conference in 1989 and 1990. By 1994, the total number of papers had increased to 35. Early lithographers focused on practical issues, such as adhesion promotion and resist edge bead. The introduction of simulation software brought on the next era of lithography. This was followed by a period of time in which RETs were developed and brought to maturity. The introduction of optical proximity corrections (OPC) initiated the next major era of lithography. The traditional path for scaling by using shorter wavelengths, decreasing k1 and increasing numerical aperture has given way to the current era of optical multiple patterning and lithography-design co-optimization. There has been sufficient activity in EUV lithography R and D to justify a separate EUV Lithography Conference as part of the annual Advanced Lithography Symposium. Each era builds on the cumulative knowledge gained previously. Over time, there have been parallel developments in optics, exposure tools, resist, metrology and mask technology, many of which were associated with changes in the wavelength of light used for leading-edge lithography.

  10. Advanced Turbine Technology Applications Project (ATTAP)

    NASA Technical Reports Server (NTRS)

    1994-01-01

    Reports technical effort by AlliedSignal Engines in sixth year of DOE/NASA funded project. Topics include: gas turbine engine design modifications of production APU to incorporate ceramic components; fabrication and processing of silicon nitride blades and nozzles; component and engine testing; and refinement and development of critical ceramics technologies, including: hot corrosion testing and environmental life predictive model; advanced NDE methods for internal flaws in ceramic components; and improved carbon pulverization modeling during impact. ATTAP project is oriented toward developing high-risk technology of ceramic structural component design and fabrication to carry forward to commercial production by 'bridging the gap' between structural ceramics in the laboratory and near-term commercial heat engine application. Current ATTAP project goal is to support accelerated commercialization of advanced, high-temperature engines for hybrid vehicles and other applications. Project objectives are to provide essential and substantial early field experience demonstrating ceramic component reliability and durability in modified, available, gas turbine engine applications; and to scale-up and improve manufacturing processes of ceramic turbine engine components and demonstrate application of these processes in the production environment.

  11. Advanced Applications of RNA Sequencing and Challenges

    PubMed Central

    Han, Yixing; Gao, Shouguo; Muegge, Kathrin; Zhang, Wei; Zhou, Bing

    2015-01-01

    Next-generation sequencing technologies have revolutionarily advanced sequence-based research with the advantages of high-throughput, high-sensitivity, and high-speed. RNA-seq is now being used widely for uncovering multiple facets of transcriptome to facilitate the biological applications. However, the large-scale data analyses associated with RNA-seq harbors challenges. In this study, we present a detailed overview of the applications of this technology and the challenges that need to be addressed, including data preprocessing, differential gene expression analysis, alternative splicing analysis, variants detection and allele-specific expression, pathway analysis, co-expression network analysis, and applications combining various experimental procedures beyond the achievements that have been made. Specifically, we discuss essential principles of computational methods that are required to meet the key challenges of the RNA-seq data analyses, development of various bioinformatics tools, challenges associated with the RNA-seq applications, and examples that represent the advances made so far in the characterization of the transcriptome. PMID:26609224

  12. Method for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, G. D.

    2000-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  13. Method for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, Glenn D.

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  14. Defect tolerant transmission lithography mask

    DOEpatents

    Vernon, Stephen P.

    2000-01-01

    A transmission lithography mask that utilizes a transparent substrate or a partially transparent membrane as the active region of the mask. A reflective single layer or multilayer coating is deposited on the membrane surface facing the illumination system. The coating is selectively patterned (removed) to form transmissive (bright) regions. Structural imperfections and defects in the coating have negligible effect on the aerial image of the mask master pattern since the coating is used to reflect radiation out of the entrance pupil of the imaging system. Similarly, structural imperfections in the clear regions of the membrane have little influence on the amplitude or phase of the transmitted electromagnetic fields. Since the mask "discards," rather than absorbs, unwanted radiation, it has reduced optical absorption and reduced thermal loading as compared to conventional designs. For EUV applications, the mask circumvents the phase defect problem, and is independent of the thermal load during exposure.

  15. Supercritical fluid extraction: Recent advances and applications.

    PubMed

    Herrero, Miguel; Mendiola, Jose A; Cifuentes, Alejandro; Ibáñez, Elena

    2010-04-16

    Among the different extraction techniques used at analytical and preparative scale, supercritical fluid extraction (SFE) is one of the most used. This review covers the most recent developments of SFE in different fields, such as food science, natural products, by-product recovery, pharmaceutical and environmental sciences, during the period 2007-2009. The revision is focused on the most recent advances and applications in the different areas; among them, it is remarkable the strong impact of SFE to extract high value compounds from food and natural products but also its increasing importance in areas such as heavy metals recovery, enantiomeric resolution or drug delivery systems.

  16. Advanced Energetics for Aeronautical Applications. Volume II

    NASA Technical Reports Server (NTRS)

    Alexander, David S.

    2005-01-01

    NASA has identified water vapor emission into the upper atmosphere from commercial transport aircraft, particularly as it relates to the formation of persistent contrails, as a potential environmental problem. Since 1999, MSE has been working with NASA-LaRC to investigate the concept of a transport-size emissionless aircraft fueled with liquid hydrogen combined with other possible breakthrough technologies. The goal of the project is to significantly advance air transportation in the next decade and beyond. The power and propulsion (P/P) system currently being studied would be based on hydrogen fuel cells (HFCs) powering electric motors, which drive fans for propulsion. The liquid water reaction product is retained onboard the aircraft until a flight mission is completed. As of now, NASA-LaRC and MSE have identified P/P system components that, according to the high-level analysis conducted to date, are light enough to make the emissionless aircraft concept feasible. Calculated maximum aircraft ranges (within a maximum weight constraint) and other performance predictions are included in this report. This report also includes current information on advanced energy-related technologies, which are still being researched, as well as breakthrough physics concepts that may be applicable for advanced energetics and aerospace propulsion in the future.

  17. Advances in hypersonic vehicle synthesis with application to studies of advanced thermal protection system

    NASA Technical Reports Server (NTRS)

    Ardema, Mark D.

    1995-01-01

    This report summarizes the work entitled 'Advances in Hypersonic Vehicle Synthesis with Application to Studies of Advanced Thermal Protection Systems.' The effort was in two areas: (1) development of advanced methods of trajectory and propulsion system optimization; and (2) development of advanced methods of structural weight estimation. The majority of the effort was spent in the trajectory area.

  18. 12 CFR 950.2 - Authorization and application for advances; obligation to repay advances.

    Code of Federal Regulations, 2010 CFR

    2010-01-01

    ... 12 Banks and Banking 7 2010-01-01 2010-01-01 false Authorization and application for advances; obligation to repay advances. 950.2 Section 950.2 Banks and Banking FEDERAL HOUSING FINANCE BOARD FEDERAL HOME LOAN BANK ASSETS AND OFF-BALANCE SHEET ITEMS ADVANCES Advances to Members § 950.2...

  19. Automotive applications for advanced composite materials

    NASA Technical Reports Server (NTRS)

    Deutsch, G. C.

    1978-01-01

    A description is presented of nonaerospace applications for advanced composite materials with special emphasis on the automotive applications. The automotive industry has to satisfy exacting requirements to reduce the average fuel consumption of cars. A feasible approach to accomplish this involves the development of composites cars with a total weight of 2400 pounds and a fuel consumption of 33 miles per gallon. In connection with this possibility, the automotive companies have started to look seriously at composite materials. The aerospace industry has over the past decade accumulated a considerable data base on composite materials and this is being made available to the nonaerospace sector. However, the automotive companies will place prime emphasis on low cost resins which lend themselves to rapid fabrication techniques.

  20. Advanced Bragg grating filters for DWDM applications

    NASA Astrophysics Data System (ADS)

    Sokolov, Victor I.; Khudobenko, Alexander I.; Panchenko, Vladislav Y.

    2002-09-01

    The advent of the technology of Dense Wavelength Division Multiplexing (DWDM) in Optical Fiber Networks (OFNs) has resulted in the necessity of developing advanced Optical Add/Drop Multiplexers (OADMs) on the basis of submicron Bragg gratings. The OADMs for dense multichannel OFNs with bit rates 10 - 40 Gbits/s per channel and channel spacing 200, 100 and 50 GHz must possess rectangular-shaped reflection/transmission spectra and linear phase characteristic within the stop/passband. These features can not be achieved with uniform periodic Bragg gratings and therefore nonuniform gratings with space-modulated coupling coefficient should be used. We present the recent advances in the design and fabrication of narrowband wavelength-selective optical filters for DWDM applications on the basis of single-mode fibers with side-polishing and periodic relief Bragg gratings with apodized coupling coefficient. The peculiarities of propagation, interaction and diffraction of electromagnetic waves in nonuniform Bragg grating structures are considered. Narrowband reflection filters based on side-polished fibers and submicron relief gratings on SiO2 and SiO materials are designed and fabricated. The filters have stopband width 0.4 - 0.8 nm and peak reflectivity R > 98% in the 1.55 mkm wavelength communication region. Narrowband flat-top reflection filters for DWDM applications based on side-polished fibers and periodic relief Bragg gratings are designed. The schemes for multichannel integration of Bragg grating filters into OFNs are presented.

  1. 32nm node technology development using interference immersion lithography

    NASA Astrophysics Data System (ADS)

    Sewell, Harry; McCafferty, Diane; Markoya, Louis; Hendrickx, Eric; Hermans, Jan; Ronse, Kurt

    2005-05-01

    The 38nm and 32nm lithography nodes are the next major targets for optical lithography on the Semiconductor Industry Roadmap. The recently developed water-based immersion lithography using ArF illumination will be able to provide an optical solution for lithography at the 45nm node, but it will not be able to achieve the 38nm or the 32nm nodes as currently defined. To achieve these next lithographic nodes will require new, very high refractive index fluids to replace the water used in current immersion systems. This paper describes tests and experiments using an interference immersion lithography test jig to develop key technology for the 32nm node. Interference imaging printers have been available for years, and with the advent of Immersion Lithography, they have a new use. Interference immersion image printing offers users a rapid, cost-effective way to develop immersion lithography, particularly at extremely high resolutions. Although it can never replace classical lens-based lithography systems for semiconductor device production, it does offer a way to develop resist and fluid technology at a relatively low cost. Its simple image-forming format offers easy access to the basic physics of advanced imaging. Issues such as: Polarization of the image forming light rays; Fluid/resist interaction during exposure; Topcoat film performance; and the Line Edge Roughness (LER) of resists at extremely high resolutions can all be readily studied. Experiments are described and results are provided for work on: 32nm imaging tests; high refractive index fluid testing using 193nm wavelength at resolutions well beyond current lens-based system capabilities; and polarization configuration testing on 45nm, 38nm, and 32nm L/S features. Results on the performance of resists and topcoats are reported for 32nm L/S features.

  2. Lithography, metrology and nanomanufacturing

    NASA Astrophysics Data System (ADS)

    Liddle, J. Alexander; Gallatin, Gregg M.

    2011-07-01

    Semiconductor chip manufacturing is by far the predominant nanomanufacturing technology in the world today. Top-down lithography techniques are used for fabrication of logic and memory chips since, in order to function, these chips must essentially be perfect. Assuring perfection requires expensive metrology. Top of the line logic sells for several hundred thousand dollars per square metre and, even though the required metrology is expensive, it is a small percentage of the overall manufacturing cost. The level of stability and control afforded by current lithography tools means that much of this metrology can be online and statistical. In contrast, many of the novel types of nanomanufacturing currently being developed will produce products worth only a few dollars per square metre. To be cost effective, the required metrology must cost proportionately less. Fortunately many of these nanofabrication techniques, such as block copolymer self-assembly, colloidal self-assembly, DNA origami, roll-2-roll nano-imprint, etc., will not require the same level of perfection to meet specification. Given the variability of these self-assembly processes, in order to maintain process control, these techniques will require some level of real time online metrology. Hence we are led to the conclusion that future nanomanufacturing may well necessitate ``cheap'' nanometre scale metrology which functions real time and on-line, e.g. at GHz rates, in the production stream. In this paper we review top-down and bottom-up nanofabrication techniques and compare and contrast the various metrology requirements.

  3. Lithography, metrology and nanomanufacturing.

    PubMed

    Liddle, J Alexander; Gallatin, Gregg M

    2011-07-01

    Semiconductor chip manufacturing is by far the predominant nanomanufacturing technology in the world today. Top-down lithography techniques are used for fabrication of logic and memory chips since, in order to function, these chips must essentially be perfect. Assuring perfection requires expensive metrology. Top of the line logic sells for several hundred thousand dollars per square metre and, even though the required metrology is expensive, it is a small percentage of the overall manufacturing cost. The level of stability and control afforded by current lithography tools means that much of this metrology can be online and statistical. In contrast, many of the novel types of nanomanufacturing currently being developed will produce products worth only a few dollars per square metre. To be cost effective, the required metrology must cost proportionately less. Fortunately many of these nanofabrication techniques, such as block copolymer self-assembly, colloidal self-assembly, DNA origami, roll-2-roll nano-imprint, etc., will not require the same level of perfection to meet specification. Given the variability of these self-assembly processes, in order to maintain process control, these techniques will require some level of real time online metrology. Hence we are led to the conclusion that future nanomanufacturing may well necessitate "cheap" nanometre scale metrology which functions real time and on-line, e.g. at GHz rates, in the production stream. In this paper we review top-down and bottom-up nanofabrication techniques and compare and contrast the various metrology requirements.

  4. Ion Implant Enabled 2x Lithography

    NASA Astrophysics Data System (ADS)

    Martin, Patrick M.; Godet, Ludovic; Cheung, Andrew; de Cock, Gael; Hatem, Chris

    2011-01-01

    Ion implantation has many applications in microelectronics beyond doping. The broad range of species available combined with the ability to precisely control dose, angle, and energy offers compelling advantages for use in precision material modification. The application to lithography has been reported elsewhere. Integrating ion implantation into the lithography process enables scaling the feature size requirements beyond the 15 nm node with a simplified double patterning sequence. In addition, ion implant may be used to remove line edge roughness, providing tremendous advantages to meet extreme lithography imaging requirements and provide additional device stability. We examine several species (e.g. Si, Ar, etc.) and the effect of energy and impact angle on several commercially available 193 nm immersion photoresists using a Varian VIISta® single wafer high current ion implanter. The treated photoresist will be evaluated for stability in an integrated double patterning application with ion implant used to freeze the primary image. We report on critical dimension impact, pattern integrity, optical property modification, and adhesion. We analyze the impact of line edge roughness improvement beyond the work of C. Struck including the power spectral distribution. TGA and FTIR Spectroscopy results for the implanted photoresist materials will also be included.

  5. HIAD Advancements and Extension of Mission Applications

    NASA Technical Reports Server (NTRS)

    Johnson, R. Keith; Cheatwood, F. McNeil; Calomino, Anthony M.; Hughes, Stephen J.; Korzun, Ashley M.; DiNonno, John M.; Lindell, Mike C.; Swanson, Greg T.

    2016-01-01

    The Hypersonic Inflatable Aerodynamic Decelerator (HIAD) technology has made significant advancements over the last decade with flight test demonstrations and ground development campaigns. The first generation (Gen-1) design and materials were flight tested with the successful third Inflatable Reentry Vehicle Experiment flight test of a 3-m HIAD (IRVE-3). Ground development efforts incorporated materials with higher thermal capabilities for the inflatable structure (IS) and flexible thermal protection system (F-TPS) as a second generation (Gen-2) system. Current efforts and plans are focused on extending capabilities to improve overall system performance and reduce areal weight, as well as expand mission applicability. F-TPS materials that offer greater thermal resistance, and ability to be packed to greater density, for a given thickness are being tested to demonstrated thermal performance benefits and manufacturability at flight-relevant scale. IS materials and construction methods are being investigated to reduce mass, increase load capacities, and improve durability for packing. Previous HIAD systems focused on symmetric geometries using stacked torus construction. Flight simulations and trajectory analysis show that symmetrical HIADs may provide L/D up to 0.25 via movable center of gravity (CG) offsets. HIAD capabilities can be greatly expanded to suit a broader range of mission applications with asymmetric shapes and/or modulating L/D. Various HIAD concepts are being developed to provide greater control to improve landing accuracy and reduce dependency upon propulsion systems during descent and landing. Concepts being studied include a canted stack torus design, control surfaces, and morphing configurations that allow the shape to be actively manipulated for flight control. This paper provides a summary of recent HIAD development activities, and plans for future HIAD developments including advanced materials, improved construction techniques, and alternate

  6. Development of ballistic hot electron emitter and its applications to parallel processing: active-matrix massive direct-write lithography in vacuum and thin films deposition in solutions

    NASA Astrophysics Data System (ADS)

    Koshida, N.; Kojima, A.; Ikegami, N.; Suda, R.; Yagi, M.; Shirakashi, J.; Yoshida, T.; Miyaguchi, H.; Muroyama, M.; Nishino, H.; Yoshida, S.; Sugata, M.; Totsu, K.; Esashi, M.

    2015-03-01

    Making the best use of the characteristic features in nanocrystalline Si (nc-Si) ballistic hot electron source, the alternative lithographic technology is presented based on the two approaches: physical excitation in vacuum and chemical reduction in solutions. The nc-Si cold cathode is a kind of metal-insulator-semiconductor (MIS) diode, composed of a thin metal film, an nc-Si layer, an n+-Si substrate, and an ohmic back contact. Under a biased condition, energetic electrons are uniformly and directionally emitted through the thin surface electrodes. In vacuum, this emitter is available for active-matrix drive massive parallel lithography. Arrayed 100×100 emitters (each size: 10×10 μm2, pitch: 100 μm) are fabricated on silicon substrate by conventional planar process, and then every emitter is bonded with integrated complementary metal-oxide-semiconductor (CMOS) driver using through-silicon-via (TSV) interconnect technology. Electron multi-beams emitted from selected devices are focused by a micro-electro-mechanical system (MEMS) condenser lens array and introduced into an accelerating system with a demagnification factor of 100. The electron accelerating voltage is 5 kV. The designed size of each beam landing on the target is 10×10 nm2 in square. Here we discuss the fabrication process of the emitter array with TSV holes, implementation of integrated ctive-matrix driver circuit, the bonding of these components, the construction of electron optics, and the overall operation in the exposure system including the correction of possible aberrations. The experimental results of this mask-less parallel pattern transfer are shown in terms of simple 1:1 projection and parallel lithography under an active-matrix drive scheme. Another application is the use of this emitter as an active electrode supplying highly reducing electrons into solutions. A very small amount of metal-salt solutions is dripped onto the nc-Si emitter surface, and the emitter is driven without

  7. Application development environment for advanced digital workstations

    NASA Astrophysics Data System (ADS)

    Valentino, Daniel J.; Harreld, Michael R.; Liu, Brent J.; Brown, Matthew S.; Huang, Lu J.

    1998-06-01

    One remaining barrier to the clinical acceptance of electronic imaging and information systems is the difficulty in providing intuitive access to the information needed for a specific clinical task (such as reaching a diagnosis or tracking clinical progress). The purpose of this research was to create a development environment that enables the design and implementation of advanced digital imaging workstations. We used formal data and process modeling to identify the diagnostic and quantitative data that radiologists use and the tasks that they typically perform to make clinical decisions. We studied a diverse range of radiology applications, including diagnostic neuroradiology in an academic medical center, pediatric radiology in a children's hospital, screening mammography in a breast cancer center, and thoracic radiology consultation for an oncology clinic. We used object- oriented analysis to develop software toolkits that enable a programmer to rapidly implement applications that closely match clinical tasks. The toolkits support browsing patient information, integrating patient images and reports, manipulating images, and making quantitative measurements on images. Collectively, we refer to these toolkits as the UCLA Digital ViewBox toolkit (ViewBox/Tk). We used the ViewBox/Tk to rapidly prototype and develop a number of diverse medical imaging applications. Our task-based toolkit approach enabled rapid and iterative prototyping of workstations that matched clinical tasks. The toolkit functionality and performance provided a 'hands-on' feeling for manipulating images, and for accessing textual information and reports. The toolkits directly support a new concept for protocol based-reading of diagnostic studies. The design supports the implementation of network-based application services (e.g., prefetching, workflow management, and post-processing) that will facilitate the development of future clinical applications.

  8. Advanced Stirling conversion systems for terrestrial applications

    NASA Technical Reports Server (NTRS)

    Shaltens, R. K.

    1987-01-01

    Under the Department of Energy's (DOE) Solar Thermal Technology Program, Sandia National Laboratories (SNLA) is developing heat engines for terrestrial Solar Distributed Heat Receivers. SNLA has identified the Stirling to be one of the most promising candidates for the terrestrial applications. The free-piston Stirling engine (FPSE) has the potential to meet the DOE goals for both performance and cost. The National Aeronautics and Space Administration (NASA) Lewis Research Center (LeRC) is conducting free-piston Stirling activities which are directed toward a dynamic power source for space applications. Space power system requirements include high efficiency, very long life, high reliability and low vibration. The FPSE has the potential for future high power space conversion systems, either solar or nuclear. Generic free-piston technology is currently being developed by LeRC for DOE/ORNL for use with a residential heat pump under an Interagency Agreement. Since 1983, the SP-100 Program (DOD/NASA/DOE) is developing dynamic power sources for space. Although both applications (heat pump and space power) appear to be quite different, their requirements complement each other. A cooperative Interagency Agreement (IAA) was signed in 1985 with NASA Lewis to provide technical management for an Advanced Stirling Conversion System (ASCS) for SNLA. Conceptual design(s) using a free-piston Stirling (FPSE), and a heat pipe will be discussed. The ASCS will be designed using technology which can reasonably be expected to be available in the 1980's.

  9. The advanced magnetovision system for Smart application

    NASA Astrophysics Data System (ADS)

    Kaleta, Jerzy; Wiewiórski, Przemyslaw; Lewandowski, Daniel

    2010-04-01

    An original method, measurement devices and software tool for examination of magneto-mechanical phenomena in wide range of SMART applications is proposed. In many Hi-End market constructions it is necessary to carry out examinations of mechanical and magnetic properties simultaneously. Technological processes of fabrication of modern materials (for example cutting, premagnetisation and prestress) and advanced concept of using SMART structures involves the design of next generation system for optimization of electric and magnetic field distribution. The original fast and higher than million point static resolution scanner with mulitsensor probes has been constructed to measure full components of the magnetic field intensity vector H, and to visualize them into end user acceptable variant. The scanner has also the capability to acquire electric potentials on surface to work with magneto-piezo devices. Advanced electronic subsystems have been applied for processing of results in the Magscaner Vison System and the corresponding software - Maglab has been also evaluated. The Dipole Contour Method (DCM) is provided for modeling different states between magnetic and electric coupled materials and to visually explain the information of the experimental data. Dedicated software collaborating with industrial parametric systems CAD. Measurement technique consists of acquiring a cloud of points similarly as in tomography, 3D visualisation. The actually carried verification of abilities of 3D digitizer will enable inspection of SMART actuators with the cylindrical form, pellets with miniature sizes designed for oscillations dampers in various construction, for example in vehicle industry.

  10. Extending HPF for advanced data parallel applications

    NASA Technical Reports Server (NTRS)

    Chapman, Barbara; Mehrotra, Piyush; Zima, Hans

    1994-01-01

    The stated goal of High Performance Fortran (HPF) was to 'address the problems of writing data parallel programs where the distribution of data affects performance'. After examining the current version of the language we are led to the conclusion that HPF has not fully achieved this goal. While the basic distribution functions offered by the language - regular block, cyclic, and block cyclic distributions - can support regular numerical algorithms, advanced applications such as particle-in-cell codes or unstructured mesh solvers cannot be expressed adequately. We believe that this is a major weakness of HPF, significantly reducing its chances of becoming accepted in the numeric community. The paper discusses the data distribution and alignment issues in detail, points out some flaws in the basic language, and outlines possible future paths of development. Furthermore, we briefly deal with the issue of task parallelism and its integration with the data parallel paradigm of HPF.

  11. Advanced teleoperation: Technology innovations and applications

    NASA Technical Reports Server (NTRS)

    Schenker, Paul S.; Bejczy, Antal K.; Kim, Won S.

    1994-01-01

    The capability to remotely, robotically perform space assembly, inspection, servicing, and science functions would rapidly expand our presence in space, and the cost efficiency of being there. There is considerable interest in developing 'telerobotic' technologies, which also have comparably important terrestrial applications to health care, underwater salvage, nuclear waste remediation and other. Such tasks, both space and terrestrial, require both a robot and operator interface that is highly flexible and adaptive, i.e., capable of efficiently working in changing and often casually structured environments. One systems approach to this requirement is to augment traditional teleoperation with computer assists -- advanced teleoperation. We have spent a number of years pursuing this approach, and highlight some key technology developments and their potential commercial impact. This paper is an illustrative summary rather than self-contained presentation; for completeness, we include representative technical references to our work which will allow the reader to follow up items of particular interest.

  12. Surface plasmon resonance biosensors: advances and applications

    NASA Astrophysics Data System (ADS)

    Homola, Jirí

    2009-10-01

    Surface plasmon resonance (SPR) biosensors represent the most advanced label-free optical affinity biosensor technology. In the last decade numerous SPR sensor platforms have been developed and applied in the life sciences and bioanalytics. This contribution reviews the state of the art in the development of SPR (bio)sensor technology and presents selected results of research into SPR biosensors at the Institute of Photonics and Electronics, Prague. The developments discussed in detail include a miniature fiber optic SPR sensor for localized measurements, a compact SPR sensor for field use and a multichannel SPR sensor for high-throughput screening. Examples of applications for the detection of analytes related to medical diagnostics (biomarkers, hormones, antibodies), environmental monitoring (endocrine disrupting compounds), and food safety (pathogens and toxins) are given.

  13. A new architecture as transparent electrodes for solar and IR applications based on photonic structures via soft lithography

    SciTech Connect

    Kuang, Ping

    2011-01-01

    Transparent conducting electrodes with the combination of high optical transmission and good electrical conductivity are essential for solar energy harvesting and electric lighting devices. Currently, indium tin oxide (ITO) is used because ITO offers relatively high transparency (>80%) to visible light and low sheet resistance (Rs = 10 ohms/square (Ω /2)) for electrical conduction. However, ITO is costly due to limited indium reserves, and it is brittle. These disadvantages have motivated the search for other conducting electrodes with similar or better properties. There has been research on a variety of electrode structures involving carbon nanotube networks, graphene films, nanowire and nanopatterned meshes and grids. Due to their novel characteristics in light manipulation and collection, photonic crystal structures show promise for further improvement. Here, we report on a new architecture consisting of nanoscale high aspect ratio metallic photonic structures as transparent electrodes fabricated via a combination of processes. For (Au) and silver (Ag) structures, the visible light transmission can reach as high as 80%, and the sheet resistance of the structure can be as low as 3.2Ω /2. The optical transparency of the high aspect ratio metal structures at visible wavelength range is comparable to that of ITO glass, while their sheet resistance is more than 3 times lower, which indicates a much higher electrical conductivity of the metal structures. Furthermore, the high aspect ratio metal structures have very high infrared (IR) reflection (90%) for the transverse magnetic (TM) mode, which can lead to the development of fabrication of metallic structures as IR filters for heat control applications. Investigations of interdigitated structures based on the high aspect ratio metal electrodes are ongoing to study the feasibility in smart window applications in light transmission modulation.

  14. Advanced Turbine Technology Applications Project (ATTAP)

    NASA Technical Reports Server (NTRS)

    1993-01-01

    This report is the fifth in a series of Annual Technical Summary Reports for the Advanced Turbine Technology Applications Project (ATTAP), sponsored by the U.S. Department of Energy (DOE). The report was prepared by Garrett Auxiliary Power Division (GAPD), a unit of Allied-Signal Aerospace Company, a unit of Allied Signal, Inc. The report includes information provided by Garrett Ceramic Components, and the Norton Advanced Ceramics Company, (formerly Norton/TRW Ceramics), subcontractors to GAPD on the ATTAP. This report covers plans and progress on ceramics development for commercial automotive applications over the period 1 Jan. through 31 Dec. 1992. Project effort conducted under this contract is part of the DOE Gas Turbine Highway Vehicle System program. This program is directed to provide the U.S. automotive industry the high-risk, long-range technology necessary to produce gas turbine engines for automobiles with reduced fuel consumption, reduced environmental impact, and a decreased reliance on scarce materials and resources. The program is oriented toward developing the high-risk technology of ceramic structural component design and fabrication, such that industry can carry this technology forward to production in the 1990's. The ATTAP test bed engine, carried over from the previous AGT101 project, is being used for verification testing of the durability of next generation ceramic components, and their suitability for service at Reference Powertrain Design conditions. This document reports the technical effort conducted by GAPD and the ATTAP subcontractors during the fifth year of the project. Topics covered include ceramic processing definition and refinement, design improvements to the ATTAP test bed engine and test rigs, and the methodology development of ceramic impact and fracture mechanisms. Appendices include reports by ATTAP subcontractors in the development of silicon nitride materials and processes.

  15. Programmable imprint lithography template

    DOEpatents

    Cardinale, Gregory F.; Talin, Albert A.

    2006-10-31

    A template for imprint lithography (IL) that reduces significantly template production costs by allowing the same template to be re-used for several technology generations. The template is composed of an array of spaced-apart moveable and individually addressable rods or plungers. Thus, the template can be configured to provide a desired pattern by programming the array of plungers such that certain of the plungers are in an "up" or actuated configuration. This arrangement of "up" and "down" plungers forms a pattern composed of protruding and recessed features which can then be impressed onto a polymer film coated substrate by applying a pressure to the template impressing the programmed configuration into the polymer film. The pattern impressed into the polymer film will be reproduced on the substrate by subsequent processing.

  16. Commercial applications of electron beam advanced oxidation technology

    NASA Astrophysics Data System (ADS)

    Curry, Randy D.; Bosma, John T.

    1995-03-01

    Emerging commercial applications of electron-beam advanced oxidation technology offer a significant advancement in the treatment of waste steams. Both electron beam and X-ray (Brehmsstrahlung) advanced oxidation processes have been shown to be effective in the destruction of volatile and semivolatile organic compounds. Emerging commercial applications, however, far exceed in scope current applications of oxidation technologies for the destruction of simple semivolatile and volatile organic compounds in water. Emerging applications include direct treatment of contaminated soil, removal of metal ions from water and sterilization of water, sludges, and food. Application of electron beam advanced oxidation technologies are reviewed, along with electron- beam-generated X-ray (Brehmsstrahlung) advanced oxidation processes. Advantages of each technology are discussed along with advanced accelerator technologies which are applicable for commercial processing of waste streams. An overview of the U.S. companies and laboratories participating in this research area are included in this discussion.

  17. Evaluation of the dry resist octavinylsilsesquioxan and its application to three-dimensional electron-beam lithography

    NASA Astrophysics Data System (ADS)

    Koops, Hans W. P.; Babin, Sergey V.; Weber, Mark A.; Dahm, G.; Holopkin, A.; Lyakhov, M. N.

    1996-06-01

    Structurization of three-dimensional surfaces has become more and more important for micro- mechanics, micro-electronics, and micro-optics. It is widely accepted that resist processes present fewer hazards to personnel and environment than conventional wet resist processes. Octavinylsilsesquioxan is investigated as a dry negative tone resist. It is employed to structure 250 micrometer deep steep surface steps, to modify fabricated three-dimensional structures with dot gratings for metrology applications, and to generate optical micro-lenses of 6 micrometer to 150 micrometer diameter on wafers and on the end of monomode fibers. The negative tone dry resist, also known as V-T8, enables coating of arbitrary substrates by evaporation in high vacuum. After exposure it is developed in high vacuum by a dry thermal treatment at 200 degrees Celsius. The resist is characterized using layers with a thickness in the range from 50 nm to 1 micrometer. Electrons with an energy ranging from 5 keV to 50 keV are used. The sensitivity of V-T8 films is 40 (mu) C/cm2 at 20 keV, which is orders of magnitude higher than that of other dry resist systems. The resist exhibits high dry etch resistivity. Its contrast is increased from 0.7 to 2.1 using plasma etching in CF4 as a post-development step.

  18. Off-axis illumination of lithography tool

    NASA Astrophysics Data System (ADS)

    Xing, Han; Lin, Li; Bin, Ma

    2013-12-01

    Lithography tool is a necessary part for LSI and VLSI. The illumination system design is an important part in the lithography optical system design. Off-axis illumination technology is an effective way to reducing resolution of lithography. The paper introduction the basic components of lithography tool, the principle of off-axis illumination reducing the resolution of lithography and focus on the two implementations of OAI technology, finally point out advantages and disadvantage of the two implementations.

  19. Present Status and Future of EUV (Extreme Ultra Violet) Light Source Research 5.Discharge Produced Plasma Light Sources 5.2Technical Issues Regarding the Practical Application and Future Prospects of a Discharge Produced Plasma Sources for Lithography

    NASA Astrophysics Data System (ADS)

    Sato, Hiroto

    Some important issues for the practical application of a discharge-basedEUV source for lithography are described. Innovative ideas taking into consideration both plasma physics and technological elements such as pulse power, materials, and heat management are required for the solution of key issues. Engineering approaches are described with the development plan of the EUVA. It is necessary to consider the factors relating to the issue as a whole in research and development in order to produce a clean, high power and high quality photon.

  20. Antireflective surface patterned by rolling mask lithography

    NASA Astrophysics Data System (ADS)

    Seitz, Oliver; Geddes, Joseph B.; Aryal, Mukti; Perez, Joseph; Wassei, Jonathan; McMackin, Ian; Kobrin, Boris

    2014-03-01

    A growing number of commercial products such as displays, solar panels, light emitting diodes (LEDs and OLEDs), automotive and architectural glass are driving demand for glass with high performance surfaces that offer anti-reflective, self-cleaning, and other advanced functions. State-of-the-art coatings do not meet the desired performance characteristics or cannot be applied over large areas in a cost-effective manner. "Rolling Mask Lithography" (RML™) enables highresolution lithographic nano-patterning over large-areas at low-cost and high-throughput. RML is a photolithographic process performed using ultraviolet (UV) illumination transmitted through a soft cylindrical mask as it rolls across a substrate. Subsequent transfer of photoresist patterns into the substrate is achieved using an etching process, which creates a nanostructured surface. The current generation exposure tool is capable of patterning one-meter long substrates with a width of 300 mm. High-throughput and low-cost are achieved using continuous exposure of the resist by the cylindrical photomask. Here, we report on significant improvements in the application of RML™ to fabricate anti-reflective surfaces. Briefly, an optical surface can be made antireflective by "texturing" it with a nano-scale pattern to reduce the discontinuity in the index of refraction between the air and the bulk optical material. An array of cones, similar to the structure of a moth's eye, performs this way. Substrates are patterned using RML™ and etched to produce an array of cones with an aspect ratio of 3:1, which decreases the reflectivity below 0.1%.

  1. Advanced flow MRI: emerging techniques and applications.

    PubMed

    Markl, M; Schnell, S; Wu, C; Bollache, E; Jarvis, K; Barker, A J; Robinson, J D; Rigsby, C K

    2016-08-01

    Magnetic resonance imaging (MRI) techniques provide non-invasive and non-ionising methods for the highly accurate anatomical depiction of the heart and vessels throughout the cardiac cycle. In addition, the intrinsic sensitivity of MRI to motion offers the unique ability to acquire spatially registered blood flow simultaneously with the morphological data, within a single measurement. In clinical routine, flow MRI is typically accomplished using methods that resolve two spatial dimensions in individual planes and encode the time-resolved velocity in one principal direction, typically oriented perpendicular to the two-dimensional (2D) section. This review describes recently developed advanced MRI flow techniques, which allow for more comprehensive evaluation of blood flow characteristics, such as real-time flow imaging, 2D multiple-venc phase contrast MRI, four-dimensional (4D) flow MRI, quantification of complex haemodynamic properties, and highly accelerated flow imaging. Emerging techniques and novel applications are explored. In addition, applications of these new techniques for the improved evaluation of cardiovascular (aorta, pulmonary arteries, congenital heart disease, atrial fibrillation, coronary arteries) as well as cerebrovascular disease (intra-cranial arteries and veins) are presented.

  2. Advanced Stirling conversion systems for terrestrial applications

    SciTech Connect

    Shaltens, R.K.

    1987-01-01

    Sandia National Laboratories (SNLA) is developing heat engines for terrestrial Solar distributed Heat Receivers. SNLA has identified the Stirling to be one of the most promising candidates for the terrestrial applications. The free-piston Stirling engine (FPSE) has the potential to meet the DOE goals for both performance and cost. Free-piston Stirling activities which are directed toward a dynamic power source for the space application are being conducted. Space power system requirements include high efficiency, very long life, high reliability and low vibration. The FPSE has the potential for future high power space conversion systems, either solar or nuclear powered. Generic free-piston technology is currently being developed for use with a residential heat pump under an Interagency Agreement. Also, an overview is presented of proposed conceptual designs for the Advanced Stirling Conversion System (ASCS) using a free-piston Stirling engine and a liquid metal heat pipe receiver. Power extraction includes both a linear alternator and hydraulic output capable of delivering approximately 25 kW of electrical power to the electric utility grid. Target cost of the engine/alternator is 300 dollars per kilowatt at a manufacturing rate of 10,000 units per year. The design life of the ASCS is 60,000 h (30 y) with an engine overhaul at 40,000 h (20 y). Also discussed are the key features and characteristics of the ASCS conceptual designs.

  3. Advanced Turbine Technology Applications Project (ATTAP)

    NASA Technical Reports Server (NTRS)

    1992-01-01

    This report is the fourth in a series of Annual Technical Summary Reports for the Advanced Turbine Technology Applications Project (ATTAP). This report covers plans and progress on ceramics development for commercial automotive applications over the period 1 Jan. - 31 Dec. 1991. Project effort conducted under this contract is part of the DOE Gas Turbine Highway Vehicle System program. This program is directed to provide the U.S. automotive industry the high-risk, long-range technology necessary to produce gas turbine engines for automobiles with reduced fuel consumption, reduced environmental impact, and a decreased reliance on scarce materials and resources. The program is oriented toward developing the high-risk technology of ceramic structural component design and fabrication, such that industry can carry this technology forward to production in the 1990s. The ATTAP test bed engine, carried over from the previous AGT101 project, is being used for verification testing of the durability of next-generation ceramic components, and their suitability for service at Reference Powertrain Design conditions. This document reports the technical effort conducted by GAPD and the ATTAP subcontractors during the fourth year of the project. Topics covered include ceramic processing definition and refinement, design improvements to the ATTAP test bed engine and test rigs and the methodology development of ceramic impact and fracture mechanisms. Appendices include reports by ATTAP subcontractors in the development of silicon nitride and silicon carbide families of materials and processes.

  4. Advanced finite-element methods for design and analysis of nanooptical structures: applications

    NASA Astrophysics Data System (ADS)

    Burger, Sven; Zschiedrich, Lin; Pomplun, Jan; Blome, Mark; Schmidt, Frank

    2013-03-01

    An overview on recent applications of the finite-element method Maxwell-solver JCMsuite to simulation tasks in nanooptics is given. Numerical achievements in the fields of optical metamaterials, plasmonics, photonic crystal fibers, light emitting devices, solar cells, optical lithography, optical metrology, integrated optics, and photonic crystals are summarized.

  5. Advances in artificial olfaction: sensors and applications.

    PubMed

    Gutiérrez, J; Horrillo, M C

    2014-06-01

    The artificial olfaction, based on electronic systems (electronic noses), includes three basic functions that operate on an odorant: a sample handler, an array of gas sensors, and a signal-processing method. The response of these artificial systems can be the identity of the odorant, an estimate concentration of the odorant, or characteristic properties of the odour as might be perceived by a human. These electronic noses are bio inspired instruments that mimic the sense of smell. The complexity of most odorants makes characterisation difficult with conventional analysis techniques, such as gas chromatography. Sensory analysis by a panel of experts is a costly process since it requires trained people who can work for only relatively short periods of time. The electronic noses are easy to build, provide short analysis times, in real time and on-line, and show high sensitivity and selectivity to the tested odorants. These systems are non-destructive techniques used to characterise odorants in diverse applications linked with the quality of life such as: control of foods, environmental quality, citizen security or clinical diagnostics. However, there is much research still to be done especially with regard to new materials and sensors technology, data processing, interpretation and validation of results. This work examines the main features of modern electronic noses and their most important applications in the environmental, and security fields. The above mentioned main components of an electronic nose (sample handling system, more advanced materials and methods for sensing, and data processing system) are described. Finally, some interesting remarks concerning the strengths and weaknesses of electronic noses in the different applications are also mentioned.

  6. Formation of Magnetic Anisotropy by Lithography

    PubMed Central

    Kim, Si Nyeon; Nam, Yoon Jae; Kim, Yang Doo; Choi, Jun Woo; Lee, Heon; Lim, Sang Ho

    2016-01-01

    Artificial interface anisotropy is demonstrated in alternating Co/Pt and Co/Pd stripe patterns, providing a means of forming magnetic anisotropy using lithography. In-plane hysteresis loops measured along two principal directions are explained in depth by two competing shape and interface anisotropies, thus confirming the formation of interface anisotropy at the Co/Pt and Co/Pd interfaces of the stripe patterns. The measured interface anisotropy energies, which are in the range of 0.2–0.3 erg/cm2 for both stripes, are smaller than those observed in conventional multilayers, indicating a decrease in smoothness of the interfaces when formed by lithography. The demonstration of interface anisotropy in the Co/Pt and Co/Pd stripe patterns is of significant practical importance, because this setup makes it possible to form anisotropy using lithography and to modulate its strength by controlling the pattern width. Furthermore, this makes it possible to form more complex interface anisotropy by fabricating two-dimensional patterns. These artificial anisotropies are expected to open up new device applications such as multilevel bits using in-plane magnetoresistive thin-film structures. PMID:27216420

  7. Advanced Turbine Technology Applications Project (ATTAP)

    NASA Technical Reports Server (NTRS)

    1989-01-01

    ATTAP activities during the past year were highlighted by an extensive materials assessment, execution of a reference powertrain design, test-bed engine design and development, ceramic component design, materials and component characterization, ceramic component process development and fabrication, component rig design and fabrication, test-bed engine fabrication, and hot gasifier rig and engine testing. Materials assessment activities entailed engine environment evaluation of domestically supplied radial gasifier turbine rotors that were available at the conclusion of the Advanced Gas Turbine (AGT) Technology Development Project as well as an extensive survey of both domestic and foreign ceramic suppliers and Government laboratories performing ceramic materials research applicable to advanced heat engines. A reference powertrain design was executed to reflect the selection of the AGT-5 as the ceramic component test-bed engine for the ATTAP. Test-bed engine development activity focused on upgrading the AGT-5 from a 1038 C (1900 F) metal engine to a durable 1371 C (2500 F) structural ceramic component test-bed engine. Ceramic component design activities included the combustor, gasifier turbine static structure, and gasifier turbine rotor. The materials and component characterization efforts have included the testing and evaluation of several candidate ceramic materials and components being developed for use in the ATTAP. Ceramic component process development and fabrication activities were initiated for the gasifier turbine rotor, gasifier turbine vanes, gasifier turbine scroll, extruded regenerator disks, and thermal insulation. Component rig development activities included combustor, hot gasifier, and regenerator rigs. Test-bed engine fabrication activities consisted of the fabrication of an all-new AGT-5 durability test-bed engine and support of all engine test activities through instrumentation/build/repair. Hot gasifier rig and test-bed engine testing

  8. Fundamental study of green EUV lithography using natural polysaccharide for the use of pure water in developable process

    NASA Astrophysics Data System (ADS)

    Takei, Satoshi

    2016-10-01

    The eco-conscious lithography processes of using pure water instead of spin coating organic solvent and alkaline developer were described for extreme-ultraviolet and electron beam techniques of advanced photomask manufactural application. Natural polysaccharide was obtained by the esterification of the hydroxyl groups of the polysaccharide resulting in improved resolution and resist profiles after the purewater developing processes. The 100, 200, and, 300 nm line and space width, and straight profiles of polysaccharide-based resist material on hardmask underlayer were resolved at the doses of 30 μC/cm2. In addition to the superior resolution in the pure-water developing processes, the resist material containing the polysaccharide derivatives for these lithography showed good resist profiles and step filling performance on substrates.

  9. Lithography alternatives meet design style reality: How do they "line" up?

    NASA Astrophysics Data System (ADS)

    Smayling, Michael C.

    2016-03-01

    Optical lithography resolution scaling has stalled, giving innovative alternatives a window of opportunity. One important factor that impacts these lithographic approaches is the transition in design style from 2D to 1D for advanced CMOS logic. Just as the transition from 3D circuits to 2D fabrication 50 years ago created an opportunity for a new breed of electronics companies, the transition today presents exciting and challenging time for lithographers. Today, we are looking at a range of non-optical lithography processes. Those considered here can be broadly categorized: self-aligned lithography, self-assembled lithography, deposition lithography, nano-imprint lithography, pixelated e-beam lithography, shot-based e-beam lithography .Do any of these alternatives benefit from or take advantage of 1D layout? Yes, for example SAPD + CL (Self Aligned Pitch Division combined with Complementary Lithography). This is a widely adopted process for CMOS nodes at 22nm and below. Can there be additional design / process co-optimization? In spite of the simple-looking nature of 1D layout, the placement of "cut" in the lines and "holes" for interlayer connections can be tuned for a given process capability. Examples of such optimization have been presented at this conference, typically showing a reduction of at least one in the number of cut or hole patterns needed.[1,2] Can any of the alternatives complement each other or optical lithography? Yes.[3] For example, DSA (Directed Self Assembly) combines optical lithography with self-assembly. CEBL (Complementary e-Beam Lithography) combines optical lithography with SAPD for lines with shot-based e-beam lithography for cuts and holes. Does one (shrinking) size fit all? No, that's why we have many alternatives. For example NIL (Nano-imprint Lithography) has been introduced for NAND Flash patterning where the (trending lower) defectivity is acceptable for the product. Deposition lithography has been introduced in 3D NAND Flash to

  10. Resolution improvement and pattern generator development for the maskless micro-ion-beam reduction lithography system

    NASA Astrophysics Data System (ADS)

    Jiang, Ximan

    The shrinking of IC devices has followed the Moore's Law for over three decades, which states that the density of transistors on integrated circuits will double about every two years. This great achievement is obtained via continuous advance in lithography technology. With the adoption of complicated resolution enhancement technologies, such as the phase shifting mask (PSM), the optical proximity correction (OPC), optical lithography with wavelength of 193 nm has enabled 45 nm printing by immersion method. However, this achievement comes together with the skyrocketing cost of masks, which makes the production of low volume application-specific IC (ASIC) impractical. In order to provide an economical lithography approach for low to medium volume advanced IC fabrication, a maskless ion beam lithography method, called Maskless Micro-ion-beam Reduction Lithography (MMRL), has been developed in the Lawrence Berkeley National Laboratory. The development of the prototype MMRL system has been described by Dr. Vinh Van Ngo in his Ph.D. thesis. But the resolution realized on the prototype MMRL system was far from the design expectation. In order to improve the resolution of the MMRL system, the ion optical system has been investigated. By integrating a field-free limiting aperture into the optical column, reducing the electromagnetic interference and cleaning the RF plasma, the resolution has been improved to around 50 nm. Computational analysis indicates that the MMRL system can be operated with an exposure field size of 0.25 mm and a beam half angle of 1.0 mrad on the wafer plane. Ion-ion interactions have been studied with a two-particle physics model. The results are in excellent agreement with those published by the other research groups. The charge-interaction analysis of MMRL shows that the ion-ion interactions must be reduced in order to obtain a throughput higher than 10 wafers per hour on 300-mm wafers. In addition, two different maskless lithography strategies

  11. Sequence-Specific Molecular Lithography on Single DNA Molecules

    NASA Astrophysics Data System (ADS)

    Keren, Kinneret; Krueger, Michael; Gilad, Rachel; Ben-Yoseph, Gdalyahu; Sivan, Uri; Braun, Erez

    2002-07-01

    Recent advances in the realization of individual molecular-scale electronic devices emphasize the need for novel tools and concepts capable of assembling such devices into large-scale functional circuits. We demonstrated sequence-specific molecular lithography on substrate DNA molecules by harnessing homologous recombination by RecA protein. In a sequence-specific manner, we patterned the coating of DNA with metal, localized labeled molecular objects and grew metal islands on specific sites along the DNA substrate, and generated molecularly accurate stable DNA junctions for patterning the DNA substrate connectivity. In our molecular lithography, the information encoded in the DNA molecules replaces the masks used in conventional microelectronics, and the RecA protein serves as the resist. The molecular lithography works with high resolution over a broad range of length scales from nanometers to many micrometers.

  12. Advanced Turbine Technology Applications Project (ATTAP)

    NASA Technical Reports Server (NTRS)

    1993-01-01

    The Advanced Turbine Technologies Application Project (ATTAP) is in the fifth year of a multiyear development program to bring the automotive gas turbine engine to a state at which industry can make commercialization decisions. Activities during the past year included reference powertrain design updates, test-bed engine design and development, ceramic component design, materials and component characterization, ceramic component process development and fabrication, ceramic component rig testing, and test-bed engine fabrication and testing. Engine design and development included mechanical design, combustion system development, alternate aerodynamic flow testing, and controls development. Design activities included development of the ceramic gasifier turbine static structure, the ceramic gasifier rotor, and the ceramic power turbine rotor. Material characterization efforts included the testing and evaluation of five candidate high temperature ceramic materials. Ceramic component process development and fabrication, with the objective of approaching automotive volumes and costs, continued for the gasifier turbine rotor, gasifier turbine scroll, extruded regenerator disks, and thermal insulation. Engine and rig fabrication, testing, and development supported improvements in ceramic component technology. Total test time in 1992 amounted to 599 hours, of which 147 hours were engine testing and 452 were hot rig testing.

  13. Applications and advances of positron beam spectroscopy

    SciTech Connect

    Howell, R., LLNL

    1998-03-18

    Over 50 scientists from DOE-DP, DOE-ER, the national laboratories, academia and industry attended a workshop held on November 5-7, 1997 at Lawrence Livermore National Laboratory. Workshop participants were charged to address two questions: Is there a need for a national center for materials analysis using positron techniques and can the capabilities at Lawrence Livermore National Laboratory serve this need. To demonstrate the need for a national center, the workshop participants discussed the technical advantages enabled by high positron currents and advanced measurement techniques, the role that these techniques would play in materials analysis and the demand for the data. Livermore now leads the world in materials analysis capabilities by positrons due to developments in response to demands of stockpile stewardship. The Livermore facilities now include the world`s highest current beam of keV positrons, a scanning pulsed positron microprobe under development capable of three dimensional maps of defect size and concentration, an MeV positron beam for defect analysis of large samples, and electron momentum spectroscopy by positrons. It was concluded that the positron microprobe under development at LLNL and other new instruments that would be relocated at LLNL at the high current keV source are an exciting step forward in providing results for the positron technique. These new data will impact a wide variety of applications.

  14. 14 CFR 151.117 - Advance planning proposals: Procedures; application.

    Code of Federal Regulations, 2010 CFR

    2010-01-01

    ... 14 Aeronautics and Space 3 2010-01-01 2010-01-01 false Advance planning proposals: Procedures; application. 151.117 Section 151.117 Aeronautics and Space FEDERAL AVIATION ADMINISTRATION, DEPARTMENT OF... Engineering Proposals § 151.117 Advance planning proposals: Procedures; application. (a) Each eligible...

  15. Development of Damped Metal Matrix Composites for Advanced Structural Applications

    DTIC Science & Technology

    1990-04-01

    DTIP FiLE COPY Applied Research Laboratory (Dto 00 CD Technical Report NO DEVELOPMENT OF DAMPED METAL MATRIX COMPOSITES FOR ADVANCED STRUCTURAL...DEVELOPMENT OF DAMPED METAL MATRIX COMPOSITES FOR ADVANCED STRUCTURAL APPLICATIONS by Clark A. Updike Ram B. Bhagat Technical Report No. TR 90-004 April 1990... Metal Matrix Composites for Advanced Structural Applications 12 PERSONAL AUTHOR(S) C.A. Updike, R. Bhagat 1 3a TYPE OF REPORT 13b TIME COVERED 14. DATE

  16. Extreme ultraviolet lithography machine

    DOEpatents

    Tichenor, Daniel A.; Kubiak, Glenn D.; Haney, Steven J.; Sweeney, Donald W.

    2000-01-01

    An extreme ultraviolet lithography (EUVL) machine or system for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10-14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate. In one embodiment of a EUVL machine, nine optical components are utilized, with four of the optical components located in the PO box. The main or projection chamber includes vibration isolators for the PO box and a vibration isolator mounting for the substrate, with the main or projection chamber being mounted on a support structure and being isolated.

  17. Lithography overlay controller formulation

    NASA Astrophysics Data System (ADS)

    Bode, Christopher A.; Toprac, Anthony J.; Edwards, Richard D.; Edgar, Thomas F.

    2000-08-01

    Lithography overlay refers to the measurement of the alignment of successive patterns within the manufacture of semiconductor devices. Control of overlay has become of great importance in semiconductor manufacturing, as the tolerance for overlay error is continually shrinking in order to manufacture next-generation semiconductor products. Run-to-run control has become an attractive solution to many control problems within the industry, including overlay. The term run-to-run control refers to any automated procedure whereby recipe settings are updated between successive process runs in order to keep the process under control. The following discussion will present the formulation of such a controller by examining control of overlay. A brief introduction of overlay will be given, highlighting the control challenge overlay presents. A data management methodology that groups like processes together in order to improve controllability, referred to as control threads, will then be presented. Finally, a discussion of linear model predictive control will show its utility in feedback run-to-run control.

  18. Recent developments of x-ray lithography in Canada

    NASA Astrophysics Data System (ADS)

    Chaker, Mohamed; Boily, Stephane; Ginovker, A.; Jean, Alain; Kieffer, Jean-Claude; Mercier, P. P.; Pepin, Henri; Leung, Pak; Currie, John F.; Lafontaine, Hugues

    1991-08-01

    An overview of current activities in Canada is reported, including x-ray lithography studies based on laser plasma sources and x-ray mask development. In particular, the application of laser plasma sources for x-ray lithography is discussed, taking into account the industrial requirement and the present state of laser technology. The authors describe the development of silicon carbide membranes for x-ray lithography application. SiC films were prepared using either a 100 kHz plasma-enhanced chemical vapor deposition (PECVD) system or a laser ablation technique. These membranes have a relatively large diameter (> 1 in.) and a high optical transparency (> 50%). Experimental studies on stresses in tungsten films deposited with triode sputtering are reported.

  19. Advanced Turbine Technology Applications Project (ATTAP)

    NASA Technical Reports Server (NTRS)

    1990-01-01

    Advanced Turbine Technology Application Project (ATTAP) activities during the past year were highlighted by test-bed engine design and development activities; ceramic component design; materials and component characterization; ceramic component process development and fabrication; component rig testing; and test-bed engine fabrication and testing. Although substantial technical challenges remain, all areas exhibited progress. Test-bed engine design and development activity included engine mechanical design, power turbine flow-path design and mechanical layout, and engine system integration aimed at upgrading the AGT-5 from a 1038 C metal engine to a durable 1371 C structural ceramic component test-bed engine. ATTAP-defined ceramic and associated ceramic/metal component design activities include: the ceramic combustor body, the ceramic gasifier turbine static structure, the ceramic gasifier turbine rotor, the ceramic/metal power turbine static structure, and the ceramic power turbine rotors. The materials and component characterization efforts included the testing and evaluation of several candidate ceramic materials and components being developed for use in the ATTAP. Ceramic component process development and fabrication activities are being conducted for the gasifier turbine rotor, gasifier turbine vanes, gasifier turbine scroll, extruded regenerator disks, and thermal insulation. Component rig testing activities include the development of the necessary test procedures and conduction of rig testing of the ceramic components and assemblies. Four-hundred hours of hot gasifier rig test time were accumulated with turbine inlet temperatures exceeding 1204 C at 100 percent design gasifier speed. A total of 348.6 test hours were achieved on a single ceramic rotor without failure and a second ceramic rotor was retired in engine-ready condition at 364.9 test hours. Test-bed engine fabrication, testing, and development supported improvements in ceramic component technology

  20. Advances in LEDs for automotive applications

    NASA Astrophysics Data System (ADS)

    Bhardwaj, Jy; Peddada, Rao; Spinger, Benno

    2016-03-01

    High power LEDs were introduced in automotive headlights in 2006-2007, for example as full LED headlights in the Audi R8 or low beam in Lexus. Since then, LED headlighting has become established in premium and volume automotive segments and beginning to enable new compact form factors such as distributed low beam and new functions such as adaptive driving beam. New generations of highly versatile high power LEDs are emerging to meet these application needs. In this paper, we will detail ongoing advances in LED technology that enable revolutionary styling, performance and adaptive control in automotive headlights. As the standards which govern the necessary lumens on the road are well established, increasing luminance enables not only more design freedom but also headlight cost reduction with space and weight saving through more compact optics. Adaptive headlighting is based on LED pixelation and requires high contrast, high luminance, smaller LEDs with high-packing density for pixelated Matrix Lighting sources. Matrix applications require an extremely tight tolerance on not only the X, Y placement accuracy, but also on the Z height of the LEDs given the precision optics used to image the LEDs onto the road. A new generation of chip scale packaged (CSP) LEDs based on Wafer Level Packaging (WLP) have been developed to meet these needs, offering a form factor less than 20% increase over the LED emitter surface footprint. These miniature LEDs are surface mount devices compatible with automated tools for L2 board direct attach (without the need for an interposer or L1 substrate), meeting the high position accuracy as well as the optical and thermal performance. To illustrate the versatility of the CSP LEDs, we will show the results of, firstly, a reflector-based distributed low beam using multiple individual cavities each with only 20mm height and secondly 3x4 to 3x28 Matrix arrays for adaptive full beam. Also a few key trends in rear lighting and impact on LED light

  1. Photoinhibition superresolution lithography

    NASA Astrophysics Data System (ADS)

    Forman, Darren Lawrence

    While the prospect of nanoscale manufacturing has generated tremendous excitement, arbitrary patterning at nanometer length scales cannot be brought about with current photolithography---the technology that for decades has driven electronics miniaturization and enabled mass production of digital logic, memory, MEMS and flat-panel displays. This is due to the relatively long wavelength of light and diffraction, which imposes a physical not technological limit on the resolution of a far-field optical pattern. Photoinhibited superresolution (PInSR) lithography is a new scheme designed to beat the diffraction limit through two-color confinement of photopolymerization and, via efficient single-photon absorption kinetics, also be high-throughput capable. This thesis describes development of an integrated optical and materials system for investigating spatiotemporal dynamics of photoinhibited superresolution lithography, with a demonstrated 3x superresolution beyond the diffraction limit. The two-color response, arising from orthogonal photogeneration of species that participate in competing reactions, is shown to be highly complex. This is both a direct and indirect consequence of mobility. Interesting trade-offs arise: thin-film resins (necessitated by single-photon absorption kinetics) require high viscosity for film stability, but the photoinhibition effect is suppressed in viscous resins. Despite this apparent suppression, which can be overcome with high excitation of the photoinhibition system, the low mobility afforded by viscous materials is beneficial for confinement of active species. Diffusion-induced blurring of patterned photoinhibition is problematic in a resin with viscosity = 1,000 cP, and overcome in a resin with viscosity eta = 500,000 cP. Superresolution of factor 3x beyond the diffraction limit is demonstrated at 0.2 NA, with additional results indicating superresolution ability at 1.2 NA. Investigating the effect of diminished photoinhibition efficacy

  2. A double-lithography and double-reflow process and application to multi-pitch multi-height mechanical flexible interconnects

    NASA Astrophysics Data System (ADS)

    Zhang, Chaoqi; Yang, Hyung Suk; Bakir, Muhannad S.

    2017-02-01

    Wafer-level multi-pitch and multi-height mechanically flexible interconnects (MPMH MFIs) are demonstrated using a double-lithography and double-reflow process of a large array of sacrificial polymer domes with various heights (ranging from 26 µm to 66 µm). Using these domes, NiW MFIs with various pitches (ranging from 50 µm to 150 µm) are formed atop the multi-height domes using electroplating. The mechanical and electrical properties of the fabricated MPMH MFIs are characterized using indentation and four-point resistance measurements.

  3. Physical Limitations in Lithography for Microelectronics.

    ERIC Educational Resources Information Center

    Flavin, P. G.

    1981-01-01

    Describes techniques being used in the production of microelectronics kits which have replaced traditional optical lithography, including contact and optical projection printing, and X-ray and electron beam lithography. Also includes limitations of each technique described. (SK)

  4. Advanced technologies for remote sensing imaging applications

    SciTech Connect

    Wood, L.L.

    1993-06-07

    Generating and returning imagery from great distances has been generally associated with national security activities, with emphasis on reliability of system operation. (While the introduction of such capabilities was usually characterized by high levels of innovation, the evolution of such systems has followed the classical track of proliferation of ``standardized items`` expressing ever more incremental technological advances.) Recent focusing of interest on the use of remote imaging systems for commercial and scientific purposes can be expected to induce comparatively rapid advances along the axes of efficiency and technological sophistication, respectively. This paper reviews the most basic reasons for expecting the next decade of advances to dwarf the impressive accomplishments of the past ten years. The impact of these advances clearly will be felt in all major areas of large-scale human endeavor, commercial, military and scientific.

  5. Polymer nanofibers by soft lithography

    NASA Astrophysics Data System (ADS)

    Pisignano, Dario; Maruccio, Giuseppe; Mele, Elisa; Persano, Luana; Di Benedetto, Francesca; Cingolani, Roberto

    2005-09-01

    The fabrication of polymeric fibers by soft lithography is demonstrated. Polyurethane, patterned by capillarity-induced molding with high-resolution elastomeric templates, forms mm-long fibers with a diameter below 0.3μm. The Young's modulus of the fabricated structures, evaluated by force-distance scanning probe spectroscopy, has a value of 0.8MPa. This is an excellent example of nanostructures feasible by the combination of soft nanopatterning and high-resolution fabrication approaches for master templates, and particularly electron-beam lithography.

  6. Reducing DfM to practice: the lithography manufacturability assessor

    NASA Astrophysics Data System (ADS)

    Liebmann, Lars; Mansfield, Scott; Han, Geng; Culp, James; Hibbeler, Jason; Tsai, Roger

    2006-03-01

    The need for accurate quantification of all aspects of design for manufacturability using a mutually compatible set of quality-metrics and units-of-measure, is reiterated and experimentally verified. A methodology to quantify the lithography component of manufacturability is proposed and its feasibility demonstrated. Three stages of lithography manufacturability assessment are described: process window analysis on realistic integrated circuits following layout manipulations for resolution enhancement and the application of optical proximity correction, failure sensitivity analysis on simulated achievable dimensional bounds (a.k.a. variability bands), and yield risk analysis on iso-probability bands. The importance and feasibility of this technique is demonstrated by quantifying the lithography manufacturability impact of redundant contact insertion and Critical Area optimization in units that can be used to drive an overall layout optimization. The need for extensive experimental calibration and improved simulation accuracy is also highlighted.

  7. Microfabrication using soft lithography

    NASA Astrophysics Data System (ADS)

    Zhao, Xiao-Mei

    Soft Lithography is a group of non-photolithographic techniques currently being explored in our group. Four such techniques-microcontact printing (μCP), replica molding (REM), micromolding in capillaries (MIMIC), and microtransfer molding (μTM)-have been demonstrated for fabricating micro- and nanostructures of a variety of materials with dimension >=30 nm. Part I (Chapters 1-5) reviews several aspects of the three molding techniques REM, MIMIC, and μTM. Chapters 1-3 describe μTM and MIMIC, and the use of these techniques in the fabrication of functional devices. μTM is capable of generating μm-scale structures over large areas, on both planar and contoured surfaces, and is able to make 3-dimensional structures layer by layer. The capability of μTM and MIMIC has been demonstrated in the fabrication of single-mode waveguides, waveguide couplers and interferometers. The coupling between waveguides can be tailored by waveguide spacing or the differential in curing time between the waveguides and the cladding. Chapters 4-5 demonstrate the combination of REM and shrinkable polystyrene (PS) films to reduce the feature size of microstructures and to generate microstructures with high aspect ratios on both planar and curved surfaces. A shrinkable PS film is patterned with relief structures, and then heated and shrinks. Thermal shrinkage results in a 100-fold increase in the aspect ratio of the patterned microstructures in the PS film. The microstructures in the shrunken PS films can be transferred to many other materials by REM. Part II (Chapters 6-7) focuses on two issues in the microfabrication using self-assembled monolayers (SAMs) as ultrathin resists. Chapter 6 describes a selective etching solution for transferring patterns of SAMs of alkanethiolates into the underlying layers (e.g., gold, silver, and copper). This etching solution uses thiosulfate as the ligand that coordinates to the metal ions, and ferricyanide as the oxidant. It has been demonstrated to be

  8. Synthesis and characterization of advanced materials for Navy applications

    NASA Technical Reports Server (NTRS)

    Covino, J.; Lee, I.

    1994-01-01

    The synthesis of ceramics and ceramic coatings through the sol-gel process has extensive application with the United States Navy and a broad range of potential commercial applications as well. This paper surveys seven specific applications for which the Navy is investigating these advanced materials. For each area, the synthetic process is described and the characteristics of the materials are discussed.

  9. Advanced Hybrid Materials for Aerospace Propulsion Applications (Briefing Charts)

    DTIC Science & Technology

    2013-02-01

    Viewgraph 3. DATES COVERED (From - To) February 2013- April 2013 4. TITLE AND SUBTITLE Advanced hybrid materials for aerospace propulsion applications ...Many material improvements are needed for specific aerospace propulsion applications . Because the industrial community in extremely risk-averse, the...activities focused on inert materials for solid rocket propulsion applications , including the development of alternative high-temperature thermosetting

  10. Advanced thermal control for spacecraft applications

    NASA Astrophysics Data System (ADS)

    Hardesty, Robert; Parker, Kelsey

    2015-09-01

    In optical systems just like any other space borne system, thermal control plays an important role. In fact, most advanced designs are plagued with volume constraints that further complicate the thermal control challenges for even the most experienced systems engineers. Peregrine will present advances in satellite thermal control based upon passive heat transfer technologies to dissipate large thermal loads. This will address the use of 700 W/m K and higher conducting products that are five times better than aluminum on a specific basis providing enabling thermal control while maintaining structural support.

  11. Programming robotics applications on an advanced hypercube multiprocessor

    SciTech Connect

    Barhen, J.

    1986-01-01

    Specialized computer architectures for advanced robotics applications at ORNL/CESAR are based on the hypercube ensemble concept. The current status of algorithm development is summarized and results for robot dynamics and navigation problems are presented. 13 refs., 1 tab.

  12. Optical Multiple Access Network (OMAN) for advanced processing satellite applications

    NASA Technical Reports Server (NTRS)

    Mendez, Antonio J.; Gagliardi, Robert M.; Park, Eugene; Ivancic, William D.; Sherman, Bradley D.

    1991-01-01

    An OMAN breadboard for exploring advanced processing satellite circuit switch applications is introduced. Network architecture, hardware trade offs, and multiple user interference issues are presented. The breadboard test set up and experimental results are discussed.

  13. Reliability and qualification of advanced microelectronics for space applications

    NASA Technical Reports Server (NTRS)

    Kayali, S.

    2003-01-01

    This paper provides a discussion of the subject and an approach to establish a reliability and qualification methodology to facilitate the utilization of state-of-the-art advanced microelectronic devices and structures in high reliability applications.

  14. Advanced transponders for deep space applications

    NASA Technical Reports Server (NTRS)

    Nguyen, Tien M.; Kayalar, Selahattin; Yeh, Hen-Geul; Kyriacou, Charles

    1993-01-01

    Three architectures for advanced deep space transponders are proposed. The architectures possess various digital techniques such as fast Fourier transform (FFT), digital phase-locked loop (PLL), and digital sideband aided carrier detection with analog or digital turn-around ranging. Preliminary results on the design and conceptual implementation are presented. Modifications to the command detector unit (CDU) are also presented.

  15. Introduction to Natural Resources: Advanced Applications.

    ERIC Educational Resources Information Center

    Crummett, Dan

    This guide, which is designed for use with student and teacher guides to a 10-unit secondary-level course in natural resources, contains a series of student supplements and advanced assignment and job sheets that provide students with additional opportunities to explore the following areas of natural resources and conservation education: outdoor…

  16. PTTI 2030 - System Applications of Advanced Clocks

    DTIC Science & Technology

    2010-11-01

    earth quakes, volcanoes , and tsunamis. REPLACEMENT OF CELL -PHONE BACK-HAUL TIMING Though recent advances in miniature atomic clocks have...contact with other soldiers, ships, tanks, and bases. The super - ruggedized construction of each DeSoLoS can withstand the catastrophic events of war

  17. Internal state manipulation for neutral atom lithography

    NASA Astrophysics Data System (ADS)

    Thywissen, Joseph Hermann

    2000-11-01

    We examine how the manipulation of the internal states of atoms can be used for atom lithography. Metastable argon atoms pattern a substrate by activating the growth of a carbonaceous material on the surface. We develop resist/etch systems that support 20 nm feature sizes, 2:1 aspect ratios, and 103 feature height amplification. Gold, silver, silicon, silicon dioxide, and silicon nitride substrates are patterned. Standing wave quenching (SWQ) light masks are used to create 65nm- wide features spaced 401 nm apart. One application of SWQ is to create a length reference artifact. We present a detailed error budget for the pattern periodicity, and find that an accuracy of better than one part in 106 is possible. We demonstrate atom resonance lithography (ARL), the first use of frequency encoding of spatial information for atom lithography. ARL has the potential to create patterns in two dimensions whose feature size is smaller than 20 nm and whose spacing is not limited by the wavelength of the patterning light. We form features in silicon that are 2.2 μm wide and spaced 20 μm apart. Using multiple probe frequencies, we demonstrate that multiple features can be created over the area covered by a monotonic gradient. The appendices include original contributions to the theory of manipulating atoms using micro- electromagnets. We propose several ways to create a magnetic waveguide using microfabricated wire patterns on a surface. We also discuss several implications of tight confinement: single mode atom guides, elongated traps with quasi-one-dimensional energetics, and constrictions whose conductance is quantized.

  18. Biomolecular Patterning via Photocatalytic Lithography

    SciTech Connect

    Bearinger, J P; Hiddessen, A L; Wu, K J; Christian, A T; Dugan, L C; Stone, G; Camarero, J; Hinz, A K; Hubbell, J A

    2005-02-18

    We have developed a novel method for patterning surface chemistry: Photocatalytic Lithography. This technique relies on inexpensive stamp materials and light; it does not necessitate mass transport or specified substrates, and the wavelength of light should not limit feature resolution. We have demonstrated the utility of this technique through the patterning of proteins, single cells and bacteria.

  19. Graphic Arts/Offset Lithography.

    ERIC Educational Resources Information Center

    Hoisington, James; Metcalf, Joseph

    This revised curriculum for graphic arts is designed to provide secondary and postsecondary students with entry-level skills and an understanding of current printing technology. It contains lesson plans based on entry-level competencies for offset lithography as identified by educators and industry representatives. The guide is divided into 15…

  20. Reflective electron beam lithography: lithography results using CMOS controlled digital pattern generator chip

    NASA Astrophysics Data System (ADS)

    Gubiotti, Thomas; Sun, Jeff Fuge; Freed, Regina; Kidwingira, Francoise; Yang, Jason; Bevis, Chris; Carroll, Allen; Brodie, Alan; Tong, William M.; Lin, Shy-Jay; Wang, Wen-Chuan; Haspeslagh, Luc; Vereecke, Bart

    2013-03-01

    Maskless electron beam lithography can potentially extend semiconductor manufacturing to the 10 nm logic (16 nm half pitch) technology node and beyond. KLA-Tencor is developing Reflective Electron Beam Lithography (REBL) technology targeting high-volume 10 nm logic node performance. REBL uses a novel multi-column wafer writing system combined with an advanced stage architecture to enable the throughput and resolution required for a NGL system. Using a CMOS Digital Pattern Generator (DPG) chip with over one million microlenses, the system is capable of maskless printing of arbitrary patterns with pixel redundancy and pixel-by-pixel grayscaling at the wafer. Electrons are generated in a flood beam via a thermionic cathode at 50-100 keV and decelerated to illuminate the DPG chip. The DPG-modulated electron beam is then reaccelerated and demagnified 80-100x onto the wafer to be printed. Previously, KLA-Tencor reported on the development progress of the REBL tool for maskless lithography at and below the 10 nm logic technology node. Since that time, the REBL team has made good progress towards developing the REBL system and DPG for direct write lithography. REBL has been successful in manufacturing a CMOS controlled DPG chip with a stable charge drain coating and with all segments functioning. This DPG chip consists of an array of over one million electrostatic lenslets that can be switched on or off via CMOS voltages to pattern the flood electron beam. Testing has proven the validity of the design with regards to lenslet performance, contrast, lifetime, and pattern scrolling. This chip has been used in the REBL demonstration platform system for lithography on a moving stage in both PMMA and chemically amplified resist. Direct imaging of the aerial image has also been performed by magnifying the pattern at the wafer plane via a mag stack onto a YAG imaging screen. This paper will discuss the chip design improvements and new charge drain coating that have resulted in a

  1. Signal response metrology (SRM): a new approach for lithography metrology

    NASA Astrophysics Data System (ADS)

    Pandev, Stilian; Fang, Fang; Kim, Young Ki; Tsai, Jamie; Vaid, Alok; Subramany, Lokesh; Sanko, Dimitry; Ramanathan, Vidya; Zhou, Ren; Venkataraman, Kartik; Haupt, Ronny

    2015-03-01

    CD uniformity requirements at 20nm and more advanced nodes have challenged the precision limits of CD-SEM metrology, conventionally used for scanner qualification and in-line focus/dose monitoring on product wafers. Optical CD metrology has consequently gained adoption for these applications because of its superior precision, but has been limited adopted, due to challenges with long time-to-results and robustness to process variation. Both of these challenges are due to the limitations imposed by geometric modeling of the photoresist (PR) profile as required by conventional RCWA-based scatterometry. Signal Response Metrology (SRM) is a new technique that obviates the need for geometric modeling by directly correlating focus, dose, and CD to the spectral response of a scatterometry tool. Consequently, it suggests superior accuracy and robustness to process variation for focus/dose monitoring, as well as reducing the time to set up a new measurement recipe from days to hours. This work describes the fundamental concepts of SRM and the results of its application to lithography metrology and control. These results include time to results and measurement performance data on Focus, Dose and CD measurements performed on real devices and on design rule metrology targets.

  2. Advanced composite applications for sub-micron biologically derived microstructures

    NASA Technical Reports Server (NTRS)

    Schnur, J. M.; Price, R. R.; Schoen, P. E.; Bonanventura, Joseph; Kirkpatrick, Douglas

    1991-01-01

    A major thrust of advanced material development is in the area of self-assembled ultra-fine particulate based composites (micro-composites). The application of biologically derived, self-assembled microstructures to form advanced composite materials is discussed. Hollow 0.5 micron diameter cylindrical shaped microcylinders self-assemble from diacetylenic lipids. These microstructures have a multiplicity of potential applications in the material sciences. Exploratory development is proceeding in application areas such as controlled release for drug delivery, wound repair, and biofouling as well as composites for electronic and magnetic applications, and high power microwave cathodes.

  3. Recent advances in curdlan biosynthesis, biotechnological production, and applications.

    PubMed

    Zhan, Xiao-Bei; Lin, Chi-Chung; Zhang, Hong-Tao

    2012-01-01

    Curdlan is a water-insoluble β-(1,3)-glucan produced by Agrobacterium species under nitrogen-limited condition. Its heat-induced gelling properties render curdlan to be very useful in the food industry initially. Recent advances in the understanding of the role curdlan plays in both innate and adaptive immunity lead to its growing applications in biomedicine. Our review focuses on the recent advances on curdlan biosynthesis and the improvements of curdlan fermentation production both from our laboratory and many others as well as the latest advances on the new applications of curdlan and its derivatives particularly in their immunological functions in biomedicine.

  4. Two new types of microneedle array fabricated by x-ray lithography

    NASA Astrophysics Data System (ADS)

    Li, Yigui; Sugiyama, Susumu

    2004-12-01

    The microneedle for blood extraction and painless injection is a rapidly growing area of interest in bio-applications. Two new types of microneedle array are designed and developed for biomedical application. The one is hollow PMMA microneedle array with very shape tip fabricated by two times X-ray lithography (one time is with X-ray mask and one time is without X-ray mask). The other is PMMA microneedle array with tips and fluid channels fabricated by an X-ray lithography technique. The resist stage of the X-ray system driven by actuators is to realize movement lithography.

  5. Advanced composites: Design and application. Proceedings of the meeting of the Mechanical Failures Prevention Group

    NASA Technical Reports Server (NTRS)

    Shives, T. R.; Willard, W. A.

    1979-01-01

    The design and application of advanced composites is discussed with emphasis on aerospace, aircraft, automotive, marine, and industrial applications. Failure modes in advanced composites are also discussed.

  6. Mechanochemical synthesis of advanced nanomaterials for catalytic applications.

    PubMed

    Xu, Chunping; De, Sudipta; Balu, Alina M; Ojeda, Manuel; Luque, Rafael

    2015-04-21

    Mechanochemical synthesis emerged as the most advantageous, environmentally sound alternative to traditional routes for nanomaterials preparation with outstanding properties for advanced applications. Featuring simplicity, high reproducibility, mild/short reaction conditions and often solvent-free condition (dry milling), mechanochemistry can offer remarkable possibilities in the development of advanced catalytically active materials. The proposed contribution has been aimed to provide a brief account of remarkable recent findings and advances in the mechanochemical synthesis of solid phase advanced catalysts as opposed to conventional systems. The role of mechanical energy in the synthesis of solid catalysts and their application is critically discussed as well as the influence of the synthesis procedure on the physicochemical properties and the efficiency of synthesized catalysts is studied. The main purpose of this feature article is to highlight the possibilities of mechanochemical protocols in (nano)materials engineering for catalytic applications.

  7. Advanced Sensors and Applications Study (ASAS)

    NASA Technical Reports Server (NTRS)

    Chism, S. B.; Hughes, C. L.

    1976-01-01

    The present EOD requirements for sensors in the space shuttle era are reported with emphasis on those applications which were deemed important enough to warrant separate sections. The application areas developed are: (1) agriculture; (2) atmospheric corrections; (3) cartography; (4) coastal studies; (5) forestry; (6) geology; (7) hydrology; (8) land use; (9) oceanography; and (10) soil moisture. For each application area. The following aspects were covered: (1) specific goals and techniques, (2) individual sensor requirements including types, bands, resolution, etc.; (3) definition of mission requirements, type orbits, coverages, etc.; and (4) discussion of anticipated problem areas and solutions. The remote sensors required for these application areas include; (1) camera systems; (2) multispectral scanners; (3) microwave scatterometers; (4) synthetic aperture radars; (5) microwave radiometers; and (6) vidicons. The emphasis in the remote sensor area was on the evaluation of present technology implications about future systems.

  8. Advances in scintillators for medical imaging applications

    NASA Astrophysics Data System (ADS)

    van Loef, Edgar V.; Shah, Kanai S.

    2014-09-01

    A review is presented of some recent work in the field of inorganic scintillator research for medical imaging applications, in particular scintillation detectors for Single-Photon Emission Computed Tomography (SPECT) and Positron Emission Tomography (PET).

  9. Uncooled thermal imaging sensor and application advances

    NASA Astrophysics Data System (ADS)

    Norton, Peter W.; Cox, Stephen; Murphy, Bob; Grealish, Kevin; Joswick, Mike; Denley, Brian; Feda, Frank; Elmali, Loriann; Kohin, Margaret

    2006-05-01

    BAE Systems continues to advance the technology and performance of microbolometer-based thermal imaging modules and systems. 640x480 digital uncooled infrared focal plane arrays are in full production, illustrated by recent production line test data for two thousand focal plane arrays. This paper presents a snapshot of microbolometer technology at BAE Systems and an overview of two of the most important thermal imaging sensor programs currently in production: a family of thermal weapons sights for the United States Army and a thermal imager for the remote weapons station on the Stryker vehicle.

  10. Advanced miniature processing handware for ATR applications

    NASA Technical Reports Server (NTRS)

    Chao, Tien-Hsin (Inventor); Daud, Taher (Inventor); Thakoor, Anikumar (Inventor)

    2003-01-01

    A Hybrid Optoelectronic Neural Object Recognition System (HONORS), is disclosed, comprising two major building blocks: (1) an advanced grayscale optical correlator (OC) and (2) a massively parallel three-dimensional neural-processor. The optical correlator, with its inherent advantages in parallel processing and shift invariance, is used for target of interest (TOI) detection and segmentation. The three-dimensional neural-processor, with its robust neural learning capability, is used for target classification and identification. The hybrid optoelectronic neural object recognition system, with its powerful combination of optical processing and neural networks, enables real-time, large frame, automatic target recognition (ATR).

  11. Confocal and Two-Photon Microscopy: Foundations, Applications and Advances

    NASA Astrophysics Data System (ADS)

    Diaspro, Alberto

    2001-11-01

    Confocal and Two-Photon Microscopy Foundations, Applications, and Advances Edited by Alberto Diaspro Confocal and two-photon fluorescence microscopy has provided researchers with unique possibilities of three-dimensional imaging of biological cells and tissues and of other structures such as semiconductor integrated circuits. Confocal and Two-Photon Microscopy: Foundations, Applications, and Advances provides clear, comprehensive coverage of basic foundations, modern applications, and groundbreaking new research developments made in this important area of microscopy. Opening with a foreword by G. J. Brakenhoff, this reference gathers the work of an international group of renowned experts in chapters that are logically divided into balanced sections covering theory, techniques, applications, and advances, featuring: In-depth discussion of applications for biology, medicine, physics, engineering, and chemistry, including industrial applications Guidance on new and emerging imaging technology, developmental trends, and fluorescent molecules Uniform organization and review-style presentation of chapters, with an introduction, historical overview, methodology, practical tips, applications, future directions, chapter summary, and bibliographical references Companion FTP site with full-color photographs The significant experience of pioneers, leaders, and emerging scientists in the field of confocal and two-photon excitation microscopy Confocal and Two-Photon Microscopy: Foundations, Applications, and Advances is invaluable to researchers in the biological sciences, tissue and cellular engineering, biophysics, bioengineering, physics of matter, and medicine, who use these techniques or are involved in developing new commercial instruments.

  12. Multifunctional Carbon Nanostructures for Advanced Energy Storage Applications

    PubMed Central

    Wang, Yiran; Wei, Huige; Lu, Yang; Wei, Suying; Wujcik, Evan K.; Guo, Zhanhu

    2015-01-01

    Carbon nanostructures—including graphene, fullerenes, etc.—have found applications in a number of areas synergistically with a number of other materials.These multifunctional carbon nanostructures have recently attracted tremendous interest for energy storage applications due to their large aspect ratios, specific surface areas, and electrical conductivity. This succinct review aims to report on the recent advances in energy storage applications involving these multifunctional carbon nanostructures. The advanced design and testing of multifunctional carbon nanostructures for energy storage applications—specifically, electrochemical capacitors, lithium ion batteries, and fuel cells—are emphasized with comprehensive examples. PMID:28347034

  13. Ceramic applications in the advanced Stirling automotive engine

    NASA Technical Reports Server (NTRS)

    Tomazic, W. A.; Cairelli, J. E.

    1977-01-01

    The ideal cycle, its application to a practical machine, and the specific advantages of high efficiency, low emissions, multi-fuel capability, and low noise of the stirling engine are discussed. Certain portions of the Stirling engine must operate continuously at high temperature. Ceramics offer the potential of cost reduction and efficiency improvement for advanced engine applications. Potential applications for ceramics in Stirling engines, and some of the special problems pertinent to using ceramics in the Stirling engine are described. The research and technology program in ceramics which is planned to support the development of advanced Stirling engines is outlined.

  14. High performance gratings for DFB lasers fabricated by direct-write e-beam lithography

    NASA Astrophysics Data System (ADS)

    Steingrüber, R.; Zhang, Z.

    2016-10-01

    The fabrication of high performance gratings for distributed feedback (DFB) lasers by direct-write (DW) electron-beam lithography (EBL) is presented. This paper starts with a short introduction of the grating theory and various types of gratings commonly used in DFB lasers, laying out resolution requirements and other fabrication challenges. The development and optimization process of the adopted EBL technology is then disclosed to address these challenges. In the end, the state-of-the-art laser performance is demonstrated, validating the technology and also paving ways for more advanced applications in the modern optical networks. We concentrate on grating fabrication technology of DFB lasers for telecommunication applications as the technology has been continuously developed at Fraunhofer Heinrich Hertz Institute (HHI) for more than two decades.

  15. Patterning proteins and cells using soft lithography.

    PubMed

    Kane, R S; Takayama, S; Ostuni, E; Ingber, D E; Whitesides, G M

    1999-12-01

    This review describes the pattering of proteins and cells using a non-photolithographic microfabrication technology, which we call 'soft lithography' because it consists of a set of related techniques, each of which uses stamps or channels fabricated in an elastomeric ('soft') material for pattern transfer. The review covers three soft lithographic techniques: microcontact printing, patterning using microfluidic channels, and laminar flow patterning. These soft lithographic techniques are inexpensive, are procedurally simple, and can be used to pattern a variety of planar and non-planar substrates. Their successful application does not require stringent regulation of the laboratory environment, and they can be used to pattern surfaces with delicate ligands. They provide control over both the surface chemistry and the cellular environment. We discuss both the procedures for patterning based on these soft lithographic techniques, and their applications in biosensor technology, in tissue engineering, and for fundamental studies in cell biology.

  16. Advancement and application of bubble detector technology

    SciTech Connect

    Buckner, M.A.; Casson, W.H.; Sims, C.S.

    1991-01-01

    Every field is searching for it's better mouse trap, and the field of dosimetry is no different. Until recently, a dosimetrist would have been hard-pressed to identify an affordable and yet reliably accurate dosimeter for mixed neutron and gamma fields. A new technology has reared it head and is vying for position in the dosimetry community. This relatively young technology is building upon the foundation of the bubble chamber, conceptualized by Glaser in 1952 (Glaser 1952). Although the attitudes surrounding this technology, as with any new development, are somewhat mixed, with the proper combination of tweaking and innovative thought, applications of this technology hold great promise for the future of neutron dosimetry. The Dosimetry Applications Research (DOSAR) facility of Oak Ridge National Laboratory (ORNL) is looking into some innovative applications of this technology. We are investigating options for overcoming its limiting features in hopes of achieving an unprecedented level of proficiency in neutron detection. Among these are the developing and testing of a Combination Area Neutron Spectrometer, CANS, assessing the plausibility of extremity applications, the assembly of an alternative reader for research, investigation of temperature-related effects and how to correct them and considerations on the coming of age of neutron dosimetry via real time detection of bubble formation in Bubble Technology Industries Inc. (BTI) detectors. In the space allowed, we will attempt to answer the questions: (1) What areas hold the greatest promise for application of this emerging technology (2) What obstacles must be overcome before full-blown application becomes a reality ; and (3) What might the future hold 11 refs., 6 figs., 3 tabs.

  17. Advanced thermal control technology for commercial applications

    NASA Technical Reports Server (NTRS)

    Swanson, Theodore D.

    1991-01-01

    A number of the technologies previously developed for the thermal control of spacecraft have found their way into commercial application. Specialized coatings and heat pipes are but two examples. The thermal control of current and future spacecraft is becoming increasingly more demanding, and a variety of new technologies are being developed to meet these needs. Closed two-phase loops are perceived to be the answer to many of the new requirements. All of these technologies are discussed, and their spacecraft and current terrestrial applications are summarized.

  18. Applications technology satellites advanced mission study

    NASA Technical Reports Server (NTRS)

    Gould, L. M.

    1972-01-01

    Three spacecraft configurations were designed for operation as a high powered synchronous communications satellite. Each spacecraft includes a 1 kw TWT and a 2 kw Klystron power amplifier feeding an antenna with multiple shaped beams. One of the spacecraft is designed to be boosted by a Thor-Delta launch vehicle and raised to synchronous orbit with electric propulsion. The other two are inserted into a elliptical transfer orbit with an Atlas Centaur and injected into final orbit with an apogee kick motor. Advanced technologies employed in the several configurations include tubes with multiple stage collectors radiating directly to space, multiple-contoured beam antennas, high voltage rollout solar cell arrays with integral power conditioning, electric propulsion for orbit raising and on-station attitude control and station-keeping, and liquid metal slip rings.

  19. Advanced Turbine Technology Applications Project (ATTAP)

    NASA Technical Reports Server (NTRS)

    1991-01-01

    This report summarizes work performed in support of the development and demonstration of a structural ceramic technology for automotive gas turbine engines. The AGT101 regenerated gas turbine engine developed under the previous DOE/NASA Advanced Gas Turbine (AGT) program is being utilized for verification testing of the durability of next-generation ceramic components and their suitability for service at reference powertrain design conditions. Topics covered in this report include ceramic processing definition and refinement, design improvements to the test bed engine and test rigs, and design methodologies related to ceramic impact and fracture mechanisms. Appendices include reports by ATTAP subcontractors addressing the development of silicon nitride and silicon carbide families of materials and processes.

  20. Advanced communications payload for mobile applications

    NASA Technical Reports Server (NTRS)

    Ames, S. A.; Kwan, R. K.

    1990-01-01

    An advanced satellite payload is proposed for single hop linking of mobile terminals of all classes as well as Very Small Aperture Terminal's (VSAT's). It relies on an intensive use of communications on-board processing and beam hopping for efficient link design to maximize capacity and a large satellite antenna aperture and high satellite transmitter power to minimize the cost of the ground terminals. Intersatellite links are used to improve the link quality and for high capacity relay. Power budgets are presented for links between the satellite and mobile, VSAT, and hub terminals. Defeating the effects of shadowing and fading requires the use of differentially coherent demodulation, concatenated forward error correction coding, and interleaving, all on a single link basis.

  1. Advances in laser diodes for pyrotechnic applications

    NASA Technical Reports Server (NTRS)

    Craig, Richard R.

    1993-01-01

    Background information concerning the use of laser diodes in pyrotechnic applications is provided in viewgraph form. The following topics are discussed: damage limits, temperature stability, fiber coupling issues, and small (100 micron) and large (400 micron) fiber results. The discussions concerning fiber results concentrate on the areas of package geometry and electro-optical properties.

  2. System considerations for maskless lithography

    NASA Astrophysics Data System (ADS)

    Karnowski, Thomas; Joy, David; Allard, Larry; Clonts, Lloyd

    2004-05-01

    Lithographic processes for printing device structures on integrated circuits (ICs) are the fundamental technology behind Moore's law. Next-generation techniques like maskless lithography or ML2 have the advantage that the long, tedious and expensive process of fabricating a unique mask for the manufactured chip is not necessary. However, there are some rather daunting prblems with establishing ML2 as a viable commercial technology. The data rate necessary for ML2 to be competitive in manufacturing is not feasible with technology in the near future. There is also doubt that the competing technologies for the writing mechanisms and corresponding photoresist (or analogous medium) will be able to accurately produce the desired patterns necessary to produce multi-layer semiconductor devices. In this work, we model the maskless printing system from a signal processing point of view, utilizing image processing algorithms and concepts to study the effects of various real-world constraints and their implications for a ML2 system. The ML2 elements are discrete devices, and it is doubtful that their motion can be controlled to the level where a one-for-one element to exposed pixel relationship is allowable. Some level of sub-element resolution can be achieved with gray scale levels, but with the highly integrated manufacturing practices required to achieve massive parallelism, the most effective elements will be simple on-ofrf switches that fire a fixed level of energy at the target medium. Consequently gray-scale level devidces are likely not an option. Another problem with highly integrated manufacturing methods is device uniformity. Consequently, we analyze the redundant scanning array concept (RSA) conceived by Berglund et al. which can defeat many of these problems. We determine some basic equations governing its application and we focus on applying the technique to an array of low-energy electron emitters. Using the results of Monte Carlo simulations on electron beam

  3. SYSTEM CONSIDERATIONS FOR MASKLESS LITHOGRAPHY

    SciTech Connect

    Karnowski, Thomas Paul; Joy, David; Allard Jr, Lawrence Frederick; Clonts, Lloyd G

    2004-01-01

    Lithographic processes for printing device structures on integrated circuits (ICs) are the fundamental technology behind Moore's law. Next-generation techniques like maskless lithography or ML2 have the advantage that the long, tedious and expensive process of fabricating a unique mask for the manufactured chip is not necessary. However, there are some rather daunting problems with establishing ML2 as a viable commercial technology. The data rate necessary for ML2 to be competitive in manufacturing is not feasible with technology in the near future. There is also doubt that the competing technologies for the writing mechanisms and corresponding photoresist (or analogous medium) will be able to accurately produce the desired patterns necessary to produce multi-layer semiconductor devices. In this work, we model the maskless printing system from a signal processing point of view, utilizing image processing algorithms and concepts to study the effects of various real-world constraints and their implications for a ML2 system. The ML2 elements are discrete devices, and it is doubtful that their motion can be controlled to the level where a one-for-one element to exposed pixel relationship is allowable. Some level of sub-element resolution can be achieved with gray scale levels, but with the highly integrated manufacturing practices required to achieve massive parallelism, the most effective elements will be simple on-off switches that fire a fixed level of energy at the target medium. Consequently gray-scale level devices are likely not an option. Another problem with highly integrated manufacturing methods is device uniformity. Consequently, we analyze the redundant scanning array concept (RSA) conceived by Berglund et al. which can defeat many of these problems. We determine some basic equations governing its application and we focus on applying the technique to an array of low-energy electron emitters. Using the results of Monte Carlo simulations on electron beam

  4. 3D Stretchable Arch Ribbon Array Fabricated via Grayscale Lithography

    PubMed Central

    Pang, Yu; Shu, Yi; Shavezipur, Mohammad; Wang, Xuefeng; Mohammad, Mohammad Ali; Yang, Yi; Zhao, Haiming; Deng, Ningqin; Maboudian, Roya; Ren, Tian-Ling

    2016-01-01

    Microstructures with flexible and stretchable properties display tremendous potential applications including integrated systems, wearable devices and bio-sensor electronics. Hence, it is essential to develop an effective method for fabricating curvilinear and flexural microstructures. Despite significant advances in 2D stretchable inorganic structures, large scale fabrication of unique 3D microstructures at a low cost remains challenging. Here, we demonstrate that the 3D microstructures can be achieved by grayscale lithography to produce a curved photoresist (PR) template, where the PR acts as sacrificial layer to form wavelike arched structures. Using plasma-enhanced chemical vapor deposition (PECVD) process at low temperature, the curved PR topography can be transferred to the silicon dioxide layer. Subsequently, plasma etching can be used to fabricate the arched stripe arrays. The wavelike silicon dioxide arch microstructure exhibits Young modulus and fracture strength of 52 GPa and 300 MPa, respectively. The model of stress distribution inside the microstructure was also established, which compares well with the experimental results. This approach of fabricating a wavelike arch structure may become a promising route to produce a variety of stretchable sensors, actuators and circuits, thus providing unique opportunities for emerging classes of robust 3D integrated systems. PMID:27345766

  5. 3D Stretchable Arch Ribbon Array Fabricated via Grayscale Lithography

    NASA Astrophysics Data System (ADS)

    Pang, Yu; Shu, Yi; Shavezipur, Mohammad; Wang, Xuefeng; Mohammad, Mohammad Ali; Yang, Yi; Zhao, Haiming; Deng, Ningqin; Maboudian, Roya; Ren, Tian-Ling

    2016-06-01

    Microstructures with flexible and stretchable properties display tremendous potential applications including integrated systems, wearable devices and bio-sensor electronics. Hence, it is essential to develop an effective method for fabricating curvilinear and flexural microstructures. Despite significant advances in 2D stretchable inorganic structures, large scale fabrication of unique 3D microstructures at a low cost remains challenging. Here, we demonstrate that the 3D microstructures can be achieved by grayscale lithography to produce a curved photoresist (PR) template, where the PR acts as sacrificial layer to form wavelike arched structures. Using plasma-enhanced chemical vapor deposition (PECVD) process at low temperature, the curved PR topography can be transferred to the silicon dioxide layer. Subsequently, plasma etching can be used to fabricate the arched stripe arrays. The wavelike silicon dioxide arch microstructure exhibits Young modulus and fracture strength of 52 GPa and 300 MPa, respectively. The model of stress distribution inside the microstructure was also established, which compares well with the experimental results. This approach of fabricating a wavelike arch structure may become a promising route to produce a variety of stretchable sensors, actuators and circuits, thus providing unique opportunities for emerging classes of robust 3D integrated systems.

  6. Tunable Nanopatterning of Conductive Polymers via Electrohydrodynamic Lithography

    PubMed Central

    2016-01-01

    An increasing number of technologies require the fabrication of conductive structures on a broad range of scales and over large areas. Here, we introduce advanced yet simple electrohydrodynamic lithography (EHL) for patterning conductive polymers directly on a substrate with high fidelity. We illustrate the generality of this robust, low-cost method by structuring thin polypyrrole films via electric-field-induced instabilities, yielding well-defined conductive structures with feature sizes ranging from tens of micrometers to hundreds of nanometers. Exploitation of a conductive polymer induces free charge suppression of the field in the polymer film, paving the way for accessing scale sizes in the low submicron range. We show the feasibility of the polypyrrole-based structures for field-effect transistor devices. Controlled EHL pattering of conductive polymer structures at the micro and nano scale demonstrated in this study combined with the possibility of effectively tuning the dimensions of the tailor-made architectures might herald a route toward various submicron device applications in supercapacitors, photovoltaics, sensors, and electronic displays. PMID:26905779

  7. Tunable Nanopatterning of Conductive Polymers via Electrohydrodynamic Lithography.

    PubMed

    Rickard, Jonathan James Stanley; Farrer, Ian; Oppenheimer, Pola Goldberg

    2016-03-22

    An increasing number of technologies require the fabrication of conductive structures on a broad range of scales and over large areas. Here, we introduce advanced yet simple electrohydrodynamic lithography (EHL) for patterning conductive polymers directly on a substrate with high fidelity. We illustrate the generality of this robust, low-cost method by structuring thin polypyrrole films via electric-field-induced instabilities, yielding well-defined conductive structures with feature sizes ranging from tens of micrometers to hundreds of nanometers. Exploitation of a conductive polymer induces free charge suppression of the field in the polymer film, paving the way for accessing scale sizes in the low submicron range. We show the feasibility of the polypyrrole-based structures for field-effect transistor devices. Controlled EHL pattering of conductive polymer structures at the micro and nano scale demonstrated in this study combined with the possibility of effectively tuning the dimensions of the tailor-made architectures might herald a route toward various submicron device applications in supercapacitors, photovoltaics, sensors, and electronic displays.

  8. X-ray lithography source

    DOEpatents

    Piestrup, Melvin A.; Boyers, David G.; Pincus, Cary

    1991-01-01

    A high-intensity, inexpensive X-ray source for X-ray lithography for the production of integrated circuits. Foil stacks are bombarded with a high-energy electron beam of 25 to 250 MeV to produce a flux of soft X-rays of 500 eV to 3 keV. Methods of increasing the total X-ray power and making the cross section of the X-ray beam uniform are described. Methods of obtaining the desired X-ray-beam field size, optimum frequency spectrum and elminating the neutron flux are all described. A method of obtaining a plurality of station operation is also described which makes the process more efficient and economical. The satisfying of these issues makes transition radiation an exellent moderate-priced X-ray source for lithography.

  9. X-ray lithography source

    DOEpatents

    Piestrup, M.A.; Boyers, D.G.; Pincus, C.

    1991-12-31

    A high-intensity, inexpensive X-ray source for X-ray lithography for the production of integrated circuits is disclosed. Foil stacks are bombarded with a high-energy electron beam of 25 to 250 MeV to produce a flux of soft X-rays of 500 eV to 3 keV. Methods of increasing the total X-ray power and making the cross section of the X-ray beam uniform are described. Methods of obtaining the desired X-ray-beam field size, optimum frequency spectrum and eliminating the neutron flux are all described. A method of obtaining a plurality of station operation is also described which makes the process more efficient and economical. The satisfying of these issues makes transition radiation an excellent moderate-priced X-ray source for lithography. 26 figures.

  10. EUV Lithography: New Metrology Challenges

    SciTech Connect

    Wood, Obert

    2007-09-26

    Extreme ultraviolet lithography is one of the most promising printing techniques for high volume semiconductor manufacturing at the 22 nm half-pitch device node and beyond. Because its imaging wavelength is approximately twenty times shorter than those currently in use (13.5 nm versus 193-248 nm) and because EUV optics and masks must be provided with highly-precise reflective multilayer coatings, EUV lithography presents a number of new and difficult metrology challenges. In this paper, the current status of the metrology tools being used to characterize the figure and finish of EUV mirror surfaces, the defectivity and flatness of EUV mask blanks and the outgassing rates of EUV resist materials are discussed.

  11. Protein assay structured on paper by using lithography

    NASA Astrophysics Data System (ADS)

    Wilhelm, E.; Nargang, T. M.; Al Bitar, W.; Waterkotte, B.; Rapp, B. E.

    2015-03-01

    There are two main challenges in producing a robust, paper-based analytical device. The first one is to create a hydrophobic barrier which unlike the commonly used wax barriers does not break if the paper is bent. The second one is the creation of the (bio-)specific sensing layer. For this proteins have to be immobilized without diminishing their activity. We solve both problems using light-based fabrication methods that enable fast, efficient manufacturing of paper-based analytical devices. The first technique relies on silanization by which we create a flexible hydrophobic barrier made of dimethoxydimethylsilane. The second technique demonstrated within this paper uses photobleaching to immobilize proteins by means of maskless projection lithography. Both techniques have been tested on a classical lithography setup using printed toner masks and on a lithography system for maskless lithography. Using these setups we could demonstrate that the proposed manufacturing techniques can be carried out at low costs. The resolution of the paper-based analytical devices obtained with static masks was lower due to the lower mask resolution. Better results were obtained using advanced lithography equipment. By doing so we demonstrated, that our technique enables fabrication of effective hydrophobic boundary layers with a thickness of only 342 μm. Furthermore we showed that flourescine-5-biotin can be immobilized on the non-structured paper and be employed for the detection of streptavidinalkaline phosphatase. By carrying out this assay on a paper-based analytical device which had been structured using the silanization technique we proofed biological compatibility of the suggested patterning technique.

  12. High power infrared QCLs: advances and applications

    NASA Astrophysics Data System (ADS)

    Patel, C. Kumar N.

    2012-01-01

    QCLs are becoming the most important sources of laser radiation in the midwave infrared (MWIR) and longwave infrared (LWIR) regions because of their size, weight, power and reliability advantages over other laser sources in the same spectral regions. The availability of multiwatt RT operation QCLs from 3.5 μm to >16 μm with wall plug efficiency of 10% or higher is hastening the replacement of traditional sources such as OPOs and OPSELs in many applications. QCLs can replace CO2 lasers in many low power applications. Of the two leading groups in improvements in QCL performance, Pranalytica is the commercial organization that has been supplying the highest performance QCLs to various customers for over four year. Using a new QCL design concept, the non-resonant extraction [1], we have achieved CW/RT power of >4.7 W and WPE of >17% in the 4.4 μm - 5.0 μm region. In the LWIR region, we have recently demonstrated QCLs with CW/RT power exceeding 1 W with WPE of nearly 10 % in the 7.0 μm-10.0 μm region. In general, the high power CW/RT operation requires use of TECs to maintain QCLs at appropriate operating temperatures. However, TECs consume additional electrical power, which is not desirable for handheld, battery-operated applications, where system power conversion efficiency is more important than just the QCL chip level power conversion efficiency. In high duty cycle pulsed (quasi-CW) mode, the QCLs can be operated without TECs and have produced nearly the same average power as that available in CW mode with TECs. Multiwatt average powers are obtained even in ambient T>70°C, with true efficiency of electrical power-to-optical power conversion being above 10%. Because of the availability of QCLs with multiwatt power outputs and wavelength range covering a spectral region from ~3.5 μm to >16 μm, the QCLs have found instantaneous acceptance for insertion into multitude of defense and homeland security applications, including laser sources for infrared

  13. Ferrite Materials for Advanced Multifunction Microwave Systems Applications

    DTIC Science & Technology

    2006-07-05

    TITLE AND SUBTITLE 5. FUNDING NUMBERS Ferrite Materials for Advanced Multifunction Microwave Systems Applications Award No. (Grant) N00014-03-1-0070 PR...were also used in this work. (200 words) 14. SUBJECT TERMS 15. NUMBER OF PAGES Microwave ferrites , yttrium iron garnet, lithium ferrites , hexagonal...Unlimited COVER PAGE FINAL REPORT to the UNITED STATES OFFICE OF NAVAL RESEARCH Ferrite Materials for Advanced Multifunction Microwave Systems

  14. Resolution Improvement and Pattern Generator Development for theMaskless Micro-Ion-Beam Reduction Lithography System

    SciTech Connect

    Jiang, Ximan

    2006-05-18

    The shrinking of IC devices has followed the Moore's Law for over three decades, which states that the density of transistors on integrated circuits will double about every two years. This great achievement is obtained via continuous advance in lithography technology. With the adoption of complicated resolution enhancement technologies, such as the phase shifting mask (PSM), the optical proximity correction (OPC), optical lithography with wavelength of 193 nm has enabled 45 nm printing by immersion method. However, this achievement comes together with the skyrocketing cost of masks, which makes the production of low volume application-specific IC (ASIC) impractical. In order to provide an economical lithography approach for low to medium volume advanced IC fabrication, a maskless ion beam lithography method, called Maskless Micro-ion-beam Reduction Lithography (MMRL), has been developed in the Lawrence Berkeley National Laboratory. The development of the prototype MMRL system has been described by Dr. Vinh Van Ngo in his Ph.D. thesis. But the resolution realized on the prototype MMRL system was far from the design expectation. In order to improve the resolution of the MMRL system, the ion optical system has been investigated. By integrating a field-free limiting aperture into the optical column, reducing the electromagnetic interference and cleaning the RF plasma, the resolution has been improved to around 50 nm. Computational analysis indicates that the MMRL system can be operated with an exposure field size of 0.25 mm and a beam half angle of 1.0 mrad on the wafer plane. Ion-ion interactions have been studied with a two-particle physics model. The results are in excellent agreement with those published by the other research groups. The charge-interaction analysis of MMRL shows that the ion-ion interactions must be reduced in order to obtain a throughput higher than 10 wafers per hour on 300-mm wafers. In addition, two different maskless lithography strategies

  15. Advances in applications of spiking neuron networks

    NASA Astrophysics Data System (ADS)

    Cios, Krzysztof J.; Sala, Dorel M.

    2000-03-01

    In this paper, we present new findings in constructing and applications of artificial neural networks that use a biologically inspired spiking neuron model. The used model is a point neuron with the interaction between neurons described by postsynaptic potentials. The synaptic plasticity is achieved by using a temporal correlation learning rule, specified as a function of time difference between the firings of pre- and post-synaptic neurons. Using this rule we show how certain associations between neurons in a network of spiking neurons can be implemented. As an example we analyze the dynamic properties of networks of laterally connected spiking neurons and we show their capability to self-organize into topological maps in response to external stimulation. In another application we explore the capability networks of spiking neurons to solve graph algorithms by using temporal coding of distances in a given spatial configuration. The paper underlines the importance of temporal dimension in artificial neural network information processing.

  16. Advanced gloss sensing for robotic applications

    NASA Astrophysics Data System (ADS)

    Deinhammer, Christian; Brandner, Markus

    2012-10-01

    Specular gloss is an important measurand used in quality control of manufacturing processes of highly reflective parts. In this work we present an in-process quality control system to evaluate the gloss of free-form surfaces to be used in an automated polishing process. Due to the geometry of our test objects the presented sensor is mounted on a robot arm and, therefore, needs to be robust against sensor misalignment. This robustness is achieved using a 2D CCD-camera as detector which allows us to properly handle sensor orientation deviations of up to 10. The required dynamic range of the sensor is obtained based on the acquisition of high dynamic range images. We present first results of a sensor prototype and show its applicability to the target application.

  17. X ray lithography in Japan

    NASA Astrophysics Data System (ADS)

    Clemens, James T.; Hill, Robert W.; Cerrina, Franco; Fuller, Gene E.; Pease, R. F.

    1991-10-01

    Integrated circuits (semiconductors) are the key components of modern computers, communication systems, consumer electronics, and the new generations of smart machines and instruments. Japan's strong position and growing influence in the manufacture of semiconductors and systems based on them is well known and well documented. Microlithography is one the most critical elements of the semiconductor manufacturing process because it determines the minimum feature size and the functional capabilities of the semiconductor. Because it is used many times in the manufacturing sequence, the quality of the microlithography process (i.e., number of defects, control for feature size, etc.) is critical in determining the yield and cost of semiconductors and hence the competitiveness of the electronics industry. At present all volume semiconductor manufacturing is done with optical UV (ultraviolet) projection lithography, twenty-year-old photographic technology which has been and is still evolving. There are many issues that limit the technical capability and cost-effectiveness of UV lithography, and thus, alternate lithographic techniques are continuously being researched and developed. X-ray lithography, which was invented in the early 1970's, holds the promise of providing higher yields in manufacturing semiconductors by virtue of enhanced process latitude, process robustness, and resolution.

  18. MEMS temperature scanner: principles, advances, and applications

    NASA Astrophysics Data System (ADS)

    Otto, Thomas; Saupe, Ray; Stock, Volker; Gessner, Thomas

    2010-02-01

    Contactless measurement of temperatures has gained enormous significance in many application fields, ranging from climate protection over quality control to object recognition in public places or military objects. Thereby measurement of linear or spatially temperature distribution is often necessary. For this purposes mostly thermographic cameras or motor driven temperature scanners are used today. Both are relatively expensive and the motor drive devices are limited regarding to the scanning rate additionally. An economic alternative are temperature scanner devices based on micro mirrors. The micro mirror, attached in a simple optical setup, reflects the emitted radiation from the observed heat onto an adapted detector. A line scan of the target object is obtained by periodic deflection of the micro scanner. Planar temperature distribution will be achieved by perpendicularly moving the target object or the scanner device. Using Planck radiation law the temperature of the object is calculated. The device can be adapted to different temperature ranges and resolution by using different detectors - cooled or uncooled - and parameterized scanner parameters. With the basic configuration 40 spatially distributed measuring points can be determined with temperatures in a range from 350°C - 1000°C. The achieved miniaturization of such scanners permits the employment in complex plants with high building density or in direct proximity to the measuring point. The price advantage enables a lot of applications, especially new application in the low-price market segment This paper shows principle, setup and application of a temperature measurement system based on micro scanners working in the near infrared range. Packaging issues and measurement results will be discussed as well.

  19. Advanced Interconnect Roadmap for Space Applications

    NASA Technical Reports Server (NTRS)

    Galbraith, Lissa

    1999-01-01

    This paper presents the NASA electronic parts and packaging program for space applications. The topics include: 1) Forecasts; 2) Technology Challenges; 3) Research Directions; 4) Research Directions for Chip on Board (COB); 5) Research Directions for HDPs: Multichip Modules (MCMs); 6) Research Directions for Microelectromechanical systems (MEMS); 7) Research Directions for Photonics; and 8) Research Directions for Materials. This paper is presented in viewgraph form.

  20. Advances and applications of occupancy models

    USGS Publications Warehouse

    Bailey, Larissa; MacKenzie, Darry I.; Nichols, James D.

    2013-01-01

    Summary: The past decade has seen an explosion in the development and application of models aimed at estimating species occurrence and occupancy dynamics while accounting for possible non-detection or species misidentification. We discuss some recent occupancy estimation methods and the biological systems that motivated their development. Collectively, these models offer tremendous flexibility, but simultaneously place added demands on the investigator. Unlike many mark–recapture scenarios, investigators utilizing occupancy models have the ability, and responsibility, to define their sample units (i.e. sites), replicate sampling occasions, time period over which species occurrence is assumed to be static and even the criteria that constitute ‘detection’ of a target species. Subsequent biological inference and interpretation of model parameters depend on these definitions and the ability to meet model assumptions. We demonstrate the relevance of these definitions by highlighting applications from a single biological system (an amphibian–pathogen system) and discuss situations where the use of occupancy models has been criticized. Finally, we use these applications to suggest future research and model development.

  1. Advanced giant magnetoresistance technology for measurement applications

    NASA Astrophysics Data System (ADS)

    Weiss, Roland; Mattheis, Roland; Reiss, Günter

    2013-08-01

    Giant magnetoresistance (GMR) sensors are considered one of the first real applications of nanotechnology. They consist of nm-thick layered structures where ferromagnetic metals are sandwiched by nonmagnetic metals. Such multilayered films produce a large change in resistance (typically 10 to 20%) when subjected to a magnetic field, compared with a maximum change of a few per cent for other types of magnetic sensors. This technology has been intensively used in read heads for hard disk drives and now increasingly finds applications due to the high sensitivity and signal-to-noise ratio. Additionally these sensors are compatible with miniaturization and thus offer a high spatial resolution combined with a frequency range up to the 100 MHz regime and simple electronic conditioning. In this review, we first discuss the basics of the underlying magnetoresistance effects in layered structures and then present three prominent examples for future applications: in the field of current sensing the new GMR sensors offer high bandwidth and good accuracy in a space-saving open loop measurement configuration. In rotating systems they can be used for multiturn angle measurements, and in biotechnology the detection of magnetic particles enables the quantitative measurement of biomolecule concentrations.

  2. LBB application in the US operating and advanced reactors

    SciTech Connect

    Wichman, K.; Tsao, J.; Mayfield, M.

    1997-04-01

    The regulatory application of leak before break (LBB) for operating and advanced reactors in the U.S. is described. The U.S. Nuclear Regulatory Commission (NRC) has approved the application of LBB for six piping systems in operating reactors: reactor coolant system primary loop piping, pressurizer surge, safety injection accumulator, residual heat removal, safety injection, and reactor coolant loop bypass. The LBB concept has also been applied in the design of advanced light water reactors. LBB applications, and regulatory considerations, for pressurized water reactors and advanced light water reactors are summarized in this paper. Technology development for LBB performed by the NRC and the International Piping Integrity Research Group is also briefly summarized.

  3. Applications of advanced fracture mechanics to fuselage

    NASA Astrophysics Data System (ADS)

    Kanninen, M. F.; O'Donoghue, P. E.; Green, S. T.; Leung, C. P.; Roy, S.; Burnside, O. H.

    Multi-site damage (MSD) in the form of cracking at rivet holes in lap splice joints has been identified as a serious threat to the integrity of commercial aircraft nearing their design life targets. Consequently, to assure the safety of aircraft that have accumulated large numbers of flights, flight hours and years in service requires requires inspection procedures that are based on the possibility that MSD may be present. For inspections of aircraft components to be properly focused on me defect sizes that are critical for structural integrity, fracture analyses are needed. The current methods are essentially those of linear elastic fracture mechanics (LEFM) which are strictly valid only for cracks that extend in a quasi-static manner under small-scale crack tip plasticity conditions. While LEFM is very likely to be appropriate for subcritical crack growth, quantifying the conditions for fracture instability and subsequent propagation may require advanced fracture mechanics techniques. The specific focus in this paper was to identify the conditions in which inelastic-dynamic effects occur in (1) the linking up Of local damage in a lap splice joint to form a major crack, and (2) large-scale fuselage failure by a rapidly occurring fluid structure interaction process.

  4. Advanced helium magnetometer for space applications

    NASA Technical Reports Server (NTRS)

    Slocum, Robert E.

    1987-01-01

    The goal of this effort was demonstration of the concepts for an advanced helium magnetometer which meets the demands of future NASA earth orbiting, interplanetary, solar, and interstellar missions. The technical effort focused on optical pumping of helium with tunable solid state lasers. We were able to demonstrate the concept of a laser pumped helium magnetometer with improved accuracy, low power, and sensitivity of the order of 1 pT. A number of technical approaches were investigated for building a solid state laser tunable to the helium absorption line at 1083 nm. The laser selected was an Nd-doped LNA crystal pumped by a diode laser. Two laboratory versions of the lanthanum neodymium hexa-aluminate (LNA) laser were fabricated and used to conduct optical pumping experiments in helium and demonstrate laser pumped magnetometer concepts for both the low field vector mode and the scalar mode of operation. A digital resonance spectrometer was designed and built in order to evaluate the helium resonance signals and observe scalar magnetometer operation. The results indicate that the laser pumped sensor in the VHM mode is 45 times more sensitive than a lamp pumped sensor for identical system noise levels. A study was made of typical laser pumped resonance signals in the conventional magnetic resonance mode. The laser pumped sensor was operated as a scalar magnetometer, and it is concluded that magnetometers with 1 pT sensitivity can be achieved with the use of laser pumping and stable laser pump sources.

  5. The New X-Ray Lithography Beamline BL1 At DELTA

    SciTech Connect

    Lietz, D.; Paulus, M.; Sternemann, C.; Berges, U.; Hippert, B.; Tolan, M.

    2010-06-23

    Lithography using synchrotron radiation in the x-ray regime provides a powerful method to produce mechanical components of sub-millimeter size with a very good quality for microtechnological applications. In recent years the demand for x-ray lithography beamtime for industrial production of microparts increased rapidly resulting in the development of new experimental endstations at synchrotron radiation sources dedicated for the production of micromechanical devices. We present in this work the layout of the new x-ray lithography beamline BL1 at the synchrotron radiation source DELTA in Dortmund and discuss first results of exposure tests.

  6. Molecular dynamics simulations: advances and applications

    PubMed Central

    Hospital, Adam; Goñi, Josep Ramon; Orozco, Modesto; Gelpí, Josep L

    2015-01-01

    Molecular dynamics simulations have evolved into a mature technique that can be used effectively to understand macromolecular structure-to-function relationships. Present simulation times are close to biologically relevant ones. Information gathered about the dynamic properties of macromolecules is rich enough to shift the usual paradigm of structural bioinformatics from studying single structures to analyze conformational ensembles. Here, we describe the foundations of molecular dynamics and the improvements made in the direction of getting such ensemble. Specific application of the technique to three main issues (allosteric regulation, docking, and structure refinement) is discussed. PMID:26604800

  7. Multilayer reflective coatings for extreme-ultraviolet lithography

    SciTech Connect

    Montcalm, C., LLNL

    1998-03-10

    Multilayer mirror coatings which reflect extreme ultraviolet (EUV) radiation are a key enabling technology for EUV lithography. Mo/Si multilayers with reflectances of 67.5% at 13.4 nm are now routinely achieved and reflectances of 70 2% at 11.4 nm were obtained with MO/Be multilayers. High reflectance is achieved with careful control of substrate quality, layer thicknesses, multilayer materials, interface quality, and surface termination. Reflectance and film stress were found to be stable relative to the requirements for application to EUV lithography. The run-to-run reproducibility of the reflectance peak position was characterized to be better than 0.2%, providing the required wavelength matching among the seven multilayer-coated mirrors used in the present lithography system design. Uniformity of coating was improved to better than 0.5% across 150 mm diameter substrates. These improvements in EUV multilayer mirror technology will enable us to meet the stringent specifications for coating the large optical substrates for our next-generation EUV lithography system.

  8. Shadow overlap ion-beam lithography for nanoarchitectures.

    PubMed

    Choi, Yeonho; Hong, Soongweon; Lee, Luke P

    2009-11-01

    Precisely constructed nanoscale devices and nanoarchitectures with high spatial resolution are critically needed for applications in high-speed electronics, high-density memory, efficient solar cells, optoelectronics, plasmonics, optical antennas, chemical sensors, biological sensors, and nanospectroscopic imaging. Current methods of classical optical lithography are limited by the diffraction effect of light for nanolithography, and the state of art of e-beam or focused ion beam lithography limit the throughput and further reduction less than few nanometers for large-area batch fabrication. However, these limits can be surpassed surprisingly by utilizing the overlap of two shadow images. Here we present shadow overlap of ion-beam lithography (SOIL), which can combine the advantages of parallel processing, tunable capability of geometries, cost-effective method, and high spatial resolution nanofabrication technique. The SOIL method relies on the overlap of shadows created by the directional metal deposition and etching angles on prepatterned structures. Consequently, highly tunable patterns can be obtained. As examples, unprecedented nanoarchitectures for optical antennas are demonstrated by SOIL. We expect that SOIL can have a significant impact not only on nanoscale devices, but also large-scale (i.e., micro and macro) three-dimensional innovative lithography.

  9. Advanced Pattern Material for Investment Casting Applications

    SciTech Connect

    F. Douglas Neece Neil Chaudhry

    2006-02-08

    Cleveland Tool and Machine (CTM) of Cleveland, Ohio in conjunction with Harrington Product Development Center (HPDC) of Cincinnati, Ohio have developed an advanced, dimensionally accurate, temperature-stable, energy-efficient and cost-effective material and process to manufacture patterns for the investment casting industry. In the proposed technology, FOPAT (aFOam PATtern material) has been developed which is especially compatible with the investment casting process and offers the following advantages: increased dimensional accuracy; increased temperature stability; lower cost per pattern; less energy consumption per pattern; decreased cost of pattern making equipment; decreased tooling cost; increased casting yield. The present method for investment casting is "the lost wax" process, which is exactly that, the use of wax as a pattern material, which is then melted out or "lost" from the ceramic shell. The molten metal is then poured into the ceramic shell to produce a metal casting. This process goes back thousands of years and while there have been improvements in the wax and processing technology, the material is basically the same, wax. The proposed technology is based upon an established industrial process of "Reaction Injection Molding" (RIM) where two components react when mixed and then "molded" to form a part. The proposed technology has been modified and improved with the needs of investment casting in mind. A proprietary mix of components has been formulated which react and expand to form a foam-like product. The result is an investment casting pattern with smooth surface finish and excellent dimensional predictability along with the other key benefits listed above.

  10. A survey of advanced battery systems for space applications

    NASA Technical Reports Server (NTRS)

    Attia, Alan I.

    1989-01-01

    The results of a survey on advanced secondary battery systems for space applications are presented. Fifty-five battery experts from government, industry and universities participated in the survey by providing their opinions on the use of several battery types for six space missions, and their predictions of likely technological advances that would impact the development of these batteries. The results of the survey predict that only four battery types are likely to exceed a specific energy of 150 Wh/kg and meet the safety and reliability requirements for space applications within the next 15 years.

  11. Advancing differential atom interferometry for space applications

    NASA Astrophysics Data System (ADS)

    Chiow, Sheng-Wey; Williams, Jason; Yu, Nan

    2016-05-01

    Atom interferometer (AI) based sensors exhibit precision and accuracy unattainable with classical sensors, thanks to the inherent stability of atomic properties. Dual atomic sensors operating in a differential mode further extend AI applicability beyond environmental disturbances. Extraction of the phase difference between dual AIs, however, typically introduces uncertainty and systematic in excess of that warranted by each AI's intrinsic noise characteristics, especially in practical applications and real time measurements. In this presentation, we report our efforts in developing practical schemes for reducing noises and enhancing sensitivities in the differential AI measurement implementations. We will describe an active phase extraction method that eliminates the noise overhead and demonstrates a performance boost of a gravity gradiometer by a factor of 3. We will also describe a new long-baseline approach for differential AI measurements in a laser ranging assisted AI configuration. The approach uses well-developed AIs for local measurements but leverage the mature schemes of space laser interferometry for LISA and GRACE. This research was carried out at the Jet Propulsion Laboratory, California Institute of Technology, under a Contract with NASA.

  12. Analytical Protein Microarrays: Advancements Towards Clinical Applications

    PubMed Central

    Sauer, Ursula

    2017-01-01

    Protein microarrays represent a powerful technology with the potential to serve as tools for the detection of a broad range of analytes in numerous applications such as diagnostics, drug development, food safety, and environmental monitoring. Key features of analytical protein microarrays include high throughput and relatively low costs due to minimal reagent consumption, multiplexing, fast kinetics and hence measurements, and the possibility of functional integration. So far, especially fundamental studies in molecular and cell biology have been conducted using protein microarrays, while the potential for clinical, notably point-of-care applications is not yet fully utilized. The question arises what features have to be implemented and what improvements have to be made in order to fully exploit the technology. In the past we have identified various obstacles that have to be overcome in order to promote protein microarray technology in the diagnostic field. Issues that need significant improvement to make the technology more attractive for the diagnostic market are for instance: too low sensitivity and deficiency in reproducibility, inadequate analysis time, lack of high-quality antibodies and validated reagents, lack of automation and portable instruments, and cost of instruments necessary for chip production and read-out. The scope of the paper at hand is to review approaches to solve these problems. PMID:28146048

  13. Analytical Protein Microarrays: Advancements Towards Clinical Applications.

    PubMed

    Sauer, Ursula

    2017-01-29

    Protein microarrays represent a powerful technology with the potential to serve as tools for the detection of a broad range of analytes in numerous applications such as diagnostics, drug development, food safety, and environmental monitoring. Key features of analytical protein microarrays include high throughput and relatively low costs due to minimal reagent consumption, multiplexing, fast kinetics and hence measurements, and the possibility of functional integration. So far, especially fundamental studies in molecular and cell biology have been conducted using protein microarrays, while the potential for clinical, notably point-of-care applications is not yet fully utilized. The question arises what features have to be implemented and what improvements have to be made in order to fully exploit the technology. In the past we have identified various obstacles that have to be overcome in order to promote protein microarray technology in the diagnostic field. Issues that need significant improvement to make the technology more attractive for the diagnostic market are for instance: too low sensitivity and deficiency in reproducibility, inadequate analysis time, lack of high-quality antibodies and validated reagents, lack of automation and portable instruments, and cost of instruments necessary for chip production and read-out. The scope of the paper at hand is to review approaches to solve these problems.

  14. Advanced Materials and Coatings for Aerospace Applications

    NASA Technical Reports Server (NTRS)

    Miyoshi, Kazuhisa

    2004-01-01

    In the application area of aerospace tribology, researchers and developers must guarantee the highest degree of reliability for materials, components, and systems. Even a small tribological failure can lead to catastrophic results. The absence of the required knowledge of tribology, as Professor H.P. Jost has said, can act as a severe brake in aerospace vehicle systems-and indeed has already done so. Materials and coatings must be able to withstand the aerospace environments that they encounter, such as vacuum terrestrial, ascent, and descent environments; be resistant to the degrading effects of air, water vapor, sand, foreign substances, and radiation during a lengthy service; be able to withstand the loads, stresses, and temperatures encountered form acceleration and vibration during operation; and be able to support reliable tribological operations in harsh environments throughout the mission of the vehicle. This presentation id divided into two sections: surface properties and technology practice related to aerospace tribology. The first section is concerned with the fundamental properties of the surfaces of solid-film lubricants and related materials and coatings, including carbon nanotubes. The second is devoted to applications. Case studies are used to review some aspects of real problems related to aerospace systems to help engineers and scientists to understand the tribological issues and failures. The nature of each problem is analyzed, and the tribological properties are examined. All the fundamental studies and case studies were conducted at the NASA Glenn Research Center.

  15. Laser applications in advanced chip packaging

    NASA Astrophysics Data System (ADS)

    Müller, Dirk; Held, Andrew; Pätzel, Rainer; Clark, Dave; van Nunen, Joris

    2016-03-01

    While applications such as drilling μ-vias and laser direct imaging have been well established in the electronics industry, the mobile device industry's push for miniaturization is generating new demands for packaging technologies that allow for further reduction in feature size while reducing manufacturing cost. CO lasers have recently become available and their shorter wavelength allows for a smaller focus and drilling hole diameters down to 25μm whilst keeping the cost similar to CO2 lasers. Similarly, nanosecond UV lasers have gained significantly in power, become more reliable and lower in cost. On a separate front, the cost of ownership reduction for Excimer lasers has made this class of lasers attractive for structuring redistribution layers of IC substrates with feature sizes down to 2μm. Improvements in reliability and lower up-front cost for picosecond lasers is enabling applications that previously were only cost effective with mechanical means or long-pulsed lasers. We can now span the gamut from 100μm to 2μm for via drilling and can cost effectively structure redistribution layers with lasers instead of UV lamps or singulate packages with picosecond lasers.

  16. Functionalization of cellulose nanocrystals for advanced applications.

    PubMed

    Tang, Juntao; Sisler, Jared; Grishkewich, Nathan; Tam, Kam Chiu

    2017-05-15

    Replacing the widespread use of petroleum-derived non-biodegradable materials with green and sustainable materials is a pressing challenge that is gaining increasing attention by the scientific community. One such system is cellulose nanocrystal (CNC) derived from acid hydrolysis of cellulosic materials, such as plants, tunicates and agriculture biomass. The utilization of colloidal CNCs can aid in the reduction of carbon dioxide that is responsible for global warming and climate change. CNCs are excellent candidates for the design and development of functional nanomaterials in many applications due to several attractive features, such as high surface area, hydroxyl groups for functionalization, colloidal stability, low toxicity, chirality and mechanical strength. Several large scale manufacturing facilities have been commissioned to produce CNCs of up to 1000kg/day, and this has generated increasing interests in both academic and industrial laboratories. In this feature article, we will describe the recent development of functionalized cellulose nanocrystals for several important applications in ours and other laboratories. We will highlight some challenges and offer perspectives on the potentials of these sustainable nanomaterials.

  17. Nanoimprint lithography using TiO2-SiO2 ultraviolet curable materials

    NASA Astrophysics Data System (ADS)

    Takei, Satoshi

    2015-05-01

    Ultraviolet nanoimprint lithography has great potential for commercial device applications that are closest to production such as optical gratings, planar waveguides, photonic crystals, semiconductor, displays, solar cell panel, sensors, highbrightness LEDs, OLEDs, and optical data storage. I report and demonstrate the newly TiO2-SiO2 ultraviolet curable materials with 20-25 wt% ratio of high titanium for CF4/O2 etch selectivity using nanoimprint lithography process. The multiple structured three-dimensional micro- and nanolines patterns were observed to be successfully patterned over the large areas. The effect of titanium concentration on CF4/O2 etch selectivity with pattern transferring carbon layer imprinting time was investigated. CF4/O2 etching rate of the TiO2-SiO2 ultraviolet curable material was approximately 3.8 times lower than that of the referenced SiO2 sol-gel ultraviolet curable material. The TiO2-SiO2 ultraviolet curable material with high titanium concentration has been proved to be versatile in advanced nanofabrication.

  18. Advanced electrochemical concepts for NASA applications

    NASA Astrophysics Data System (ADS)

    Halpert, Gerald; Attia, Alan

    A Jet Propulsion Laboratory (JPL) survey of 23 electrochemical systems for space applications in which experts from universities, industry, and government participated is discussed. They recommended achievable specific energy for these systems and forecast the likelihood of their development of these systems by the year 1995, 2000, and 2005. The highest ranked systems for operation in planetary inner-orbit spacecraft included Na/beta-double prime-alumina/Z, where Z = S, FeCl2 or NiCl2, the upper plateau Li(Al)/FeS2 system, and the H2/O2 alkaline regenerative fuel cell. The achievable specific energy for these as operational batteries was estimated to be 130, 180 and 100 Wh/kg, respectively. For planetary outer-orbit and small geosynchronous (GEO) spacecraft Li/TiS2 (estimated 90 Wh/kg) was the choice.

  19. Advanced Heat Pipes For Optical Applications

    NASA Astrophysics Data System (ADS)

    Shaubach, Robert M.; Eastman, G. Yale

    1984-12-01

    Heat pipes offer the potential of vibrationless cooling of optical surfaces while maintaining a high degree of temperature uniformity on the cooled surface. The objective of the present program is to develop and demonstrate prototype heat pipes for this application. The material of construction is silicon; the pqwer density range is 5 to 50 Watts/per square centimeter with a nominal objective of 30 W/cm2. This paper describes the first eighteen months of work, during which the contract goals were met. The program was carried out by Thermacore on Contract F33615-82-C-5127 for the Department of the Air Force, Aeronautical Systems Division, Wright-Patterson Air Force Base, Ohio. Dr. Alan K. Hopkins of the Materials Laboratory supplied technical supervision of the program for the Air Force.

  20. An advanced unmanned vehicle for remote applications

    SciTech Connect

    Pletta, J.B.; Sackos, J.

    1998-03-01

    An autonomous mobile robotic capability is critical to developing remote work applications for hazardous environments. A few potential applications include humanitarian demining and ordnance neutralization, extraterrestrial science exploration, and hazardous waste cleanup. The ability of the remote platform to sense and maneuver within its environment is a basic technology requirement which is currently lacking. This enabling technology will open the door for force multiplication and cost effective solutions to remote operations. The ultimate goal of this work is to develop a mobile robotic platform that can identify and avoid local obstacles as it traverses from its current location to a specified destination. This goal directed autonomous navigation scheme uses the Global Positioning System (GPS) to identify the robot`s current coordinates in space and neural network processing of LADAR range images for local obstacle detection and avoidance. The initial year funding provided by this LDRD project has developed a small exterior mobile robotic development platform and a fieldable version of Sandia`s Scannerless Range Imager (SRI) system. The robotic testbed platform is based on the Surveillance And Reconnaissance ground Equipment (SARGE) robotic vehicle design recently developed for the US DoD. Contingent upon follow-on funding, future enhancements will develop neural network processing of the range map data to traverse unstructured exterior terrain while avoiding obstacles. The SRI will provide real-time range images to a neural network for autonomous guidance. Neural network processing of the range map data will allow real-time operation on a Pentium based embedded processor board.

  1. Photoresist composition for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, G. D.

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods. A photoresist composition for extreme ultraviolet radiation of boron carbide polymers, hydrochlorocarbons and mixtures thereof.

  2. Photoresist composition for extreme ultraviolet lithography

    SciTech Connect

    Felter, T.E.; Kubiak, G.D.

    1999-11-23

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4--0.05 {mu}m using projection lithography and extreme ultraviolet (EUV) radiation is disclosed. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods. A photoresist composition for extreme ultraviolet radiation of boron carbide polymers, hydrochlorocarbons and mixtures thereof.

  3. Coupling-aware mixed dummy metal insertion for lithography

    NASA Astrophysics Data System (ADS)

    Deng, Liang; Wong, Martin D. F.; Chao, Kai-Yuan; Xiang, Hua

    2007-03-01

    As integrated circuits manufacturing technology is advancing into 65nm and 45nm nodes, extensive resolution enhancement techniques (RET) are needed to correctly manufacture a chip design. The widely used RET called offaxis illumination (OAI) introduces forbidden pitches which lead to very complex design rules. It has been observed that imposing uniformity on layout designs can substantially improve printability under OAI. In this paper, two types of assist features for the metal layer are proposed to improve the uniformity, printable assist feature and segmented printable assist feature. They bring different costs on performance and manufacturing. Coupling and lithography costs from these assist features are discussed. Optimal insertion algorithm is proposed to use both types of dummy metals, considering trade-offs between coupling and lithography costs.

  4. High resolution patterning for flexible electronics via roll-to-roll nanoimprint lithography

    NASA Astrophysics Data System (ADS)

    Sabik, Sami; de Riet, Joris; Yakimets, Iryna; Smits, Edsger

    2014-03-01

    Flexible electronics is a growing field and is currently maturing in applications such as displays, smart packaging, organic light-emitting diodes and organic photovoltaic cells. In order to process on flexible substrates at high throughput and large areas, novel patterning techniques will be essential. Conventional optical lithography is limited in throughput as well as resolution, and requires several alignment steps to generate multi-layered patterns, required for applications such as thin-film transistors. It therefore remains a complex and expensive process. Nanoimprint lithography is an emerging alternative to optical lithography, demonstrating patterning capabilities over a wide range of resolutions, from several microns down to a few nanometres. For display applications, nanoimprint lithography can be used to pattern various layers. Micron sized thin-film transistors for backplane can be fabricated where a self-aligned geometry is used to decrease the number of alignment steps, and increase the overlay accuracy. In addition, nano-structures can be used for optical applications such as anti-reflective surfaces and nano patterned transparent electrodes. Imprint lithography is a fully roll-to-roll compatible process and enables large area and high throughput fabrication for flexible electronics. In this paper we discuss the possibilities and the challenges of large area patterning by roll-to-roll nanoimprint lithography, reviewing micron and nano sized structures realized on our roll-to-roll equipment. Nano patterned transparent electrodes, moth-eye antireflective coatings, and multilevel structures will be covered.

  5. [Advances in the application of smart phones in modern medicine].

    PubMed

    Wang, Lin; Hu, Jie; Li, Fei; Wei, Huilin; Li, Ying; Lu, Tianjian; Wang, Shuqi; Xu, Feng

    2014-02-01

    Since smart phones have been developed, significant advances in the function of mobile phone due to the development of software, hardware and accessories have been reached. Till now, smart phones have been engaged in daily life with an increasing impact. As a new medical model, mobile phone medicine is emerging and has found wide spread applications in medicine, especially in diagnosing, monitoring and screening various diseases. In addition, mo bile phone medical application shows great potential trend to improve healthcare in resource-limited regions due to its advantageous features of portability and information communication capability. Nowadays, the scientific and technological issues related to mobile phone medicine have attracted worldwide attention. In this review, we summarize state-of-the-art advances of mobile phone medicine with focus on its diagnostics applications in order to expand the fields of their applications and promote healthcare informatization.

  6. Advanced photovoltaic power system technology for lunar base applications

    NASA Technical Reports Server (NTRS)

    Brinker, David J.; Flood, Dennis J.

    1992-01-01

    The development of an advanced photovoltaic power system that would have application for a manned lunar base is currently planned under the Surface Power element of Pathfinder. Significant mass savings over state-of-the-art photovoltaic/battery systems are possible with the use of advanced lightweight solar arrays coupled with regenerative fuel cell storage. The solar blanket, using either ultrathin GaAs or amorphous silicon solar cells, would be integrated with a reduced-g structure. Regenerative fuel cells with high-pressure gas storage in filament-wound tanks are planned for energy storage. An advanced PV/RFC power system is a leading candidate for a manned lunar base as it offers a tremendous weight advantage over state-of-the-art photovoltaic/battery systems and is comparable in mass to other advanced power generation technologies.

  7. Membrane projection lithography

    DOEpatents

    Burckel, David Bruce; Davids, Paul S; Resnick, Paul J; Draper, Bruce L

    2015-03-17

    The various technologies presented herein relate to a three dimensional manufacturing technique for application with semiconductor technologies. A membrane layer can be formed over a cavity. An opening can be formed in the membrane such that the membrane can act as a mask layer to the underlying wall surfaces and bottom surface of the cavity. A beam to facilitate an operation comprising any of implantation, etching or deposition can be directed through the opening onto the underlying surface, with the opening acting as a mask to control the area of the underlying surfaces on which any of implantation occurs, material is removed, and/or material is deposited. The membrane can be removed, a new membrane placed over the cavity and a new opening formed to facilitate another implantation, etching, or deposition operation. By changing the direction of the beam different wall/bottom surfaces can be utilized to form a plurality of structures.

  8. Advanced Boost System Developing for High EGR Applications

    SciTech Connect

    Sun, Harold

    2012-09-30

    To support industry efforts of clean and efficient internal combustion engine development for passenger and commercial applications • This program focuses on turbocharger improvement for medium and light duty diesel applications, from complete system optimization percepective to enable commercialization of advanced diesel combustion technologies, such as HCCI/LTC. • Improve combined turbocharger efficiency up to 10% or fuel economy by 3% on FTP cycle at Tier II Bin 5 emission level.

  9. Spacecraft applications of advanced global positioning system technology

    NASA Technical Reports Server (NTRS)

    Huth, Gaylord; Dodds, James; Udalov, Sergei; Austin, Richard; Loomis, Peter; Duboraw, I. Newton, III

    1988-01-01

    The purpose of this study was to evaluate potential uses of Global Positioning System (GPS) in spacecraft applications in the following areas: attitude control and tracking; structural control; traffic control; and time base definition (synchronization). Each of these functions are addressed. Also addressed are the hardware related issues concerning the application of GPS technology and comparisons are provided with alternative instrumentation methods for specific functions required for an advanced low earth orbit spacecraft.

  10. Comparison of measurement methods for microsystem components: application to microstructures made by the deep x-ray lithography process (x-ray LIGA)

    NASA Astrophysics Data System (ADS)

    Meyer, Pascal; Mäder, Olaf; Saile, Volker; Schulz, Joachim

    2009-08-01

    The LIGA (a German acronym for lithography, electroplating and molding) process using highly parallel x-rays permits the production of a microstructure with still unique characteristics: high aspect ratio, high accuracy, high perpendicularity and lower roughness of the side wall. From a marketing point of view, this qualitative description might suffice to attract users to the technology. Regarding widespread commercialization and standardization of x-ray LIGA products, our goal is to establish a rigorous dimensional metrology for which we need to understand and quantify uncertainty, which is the key to accuracy. We report on our metrological study using a coordinate measurement machine (CMM) equipped with a fibre probe (3D measurements) which will be compared to two versions of lateral top-view measurements (2D/surface measurements): an optical microscope provided with a micrometric table and a CMM with an image processing sensor; these two types of measurement methods being complementary. In fact, microsystem technology requires measurements to be performed with precision and accuracy within the range of 0.1 µm. In this paper, we present an analysis and a discussion of both types of measurement systems. The precision and reproducibility of the CMM (with fibre probe) during a two-year study will be exposed; a calibrated series part is being measured every time the machine is used. In this case, the CMM is used as a comparator. Its accuracy and the calibration of the ball diameter using an etalon (ceramic gage block) will be exposed. Furthermore, by taking into account the results obtained by the measurement system analysis (MSA), we will show the measurement's impact on the process by taking as an example the fabrication of mm gold gears for watch industry; a quantitative description of process reproducibility and of the influence of processing parameters influence will be possible in the future.

  11. PREFACE: Advanced Materials for Demanding Applications

    NASA Astrophysics Data System (ADS)

    McMillan, Alison; Schofield, Stephen; Kelly, Michael

    2015-02-01

    This was a special conference. It was small enough (60+ delegates) but covering a wide range of topics, under a broad end-use focussed heading. Most conferences today either have hundreds or thousands of delegates or are small and very focussed. The topics ranged over composite materials, the testing of durability aspects of materials, and an eclectic set of papers on radar screening using weak ionized plasmas, composites for microvascular applications, composites in space rockets, and materials for spallation neutron sources etc. There were several papers of new characterisation techniques and, very importantly, several papers that started with the end-user requirements leading back into materials selection. In my own area, there were three talks about the technology for the ultra-precise positioning of individual atoms, donors, and complete monolayers to take modern electronics and optoelectronics ideas closer to the market place. The President of the Institute opened with an experience-based talk on translating innovative technology into business. Everyone gave a generous introduction to bring all-comers up to speed with the burning contemporary issues. Indeed, I wish that a larger cohort of first-year engineering PhD students were present to see the full gamut of what takes a physics idea to a success in the market place. I would urge groups to learn from Prof Alison McMillan (a Vice President of the Institute of Physics) and Steven Schofield, to set up conferences of similar scale and breadth. I took in more than I do from mega-meetings, and in greater depth. Professor Michael Kelly Department of Engineering University of Cambridge

  12. Advanced atomic force microscopy: Development and application

    NASA Astrophysics Data System (ADS)

    Walters, Deron A.

    Over the decade since atomic force microscopy (AFM) was invented, development of new microscopes has been closely intertwined with application of AFM to problems of interest in physics, chemistry, biology, and engineering. New techniques such as tapping mode AFM move quickly in our lab from the designer's bench to the user's table-since this is often the same piece of furniture. In return, designers get ample feedback as to what problems are limiting current instruments, and thus need most urgent attention. Tip sharpness and characterization are such a problem. Chapter 1 describes an AFM designed to operate in a scanning electron microscope, whose electron beam is used to deposit sharp carbonaceous tips. These tips can be tested and used in situ. Another limitation is addressed in Chapter 2: the difficulty of extracting more than just topographic information from a sample. A combined AFM/confocal optical microscope was built to provide simultaneous, independent images of the topography and fluorescence of a sample. In combination with staining or antibody labelling, this could provide submicron information about the composition of a sample. Chapters 3 and 4 discuss two generations of small cantilevers developed for lower-noise, higher-speed AFM of biological samples. In Chapter 4, a 26 mum cantilever is used to image the process of calcite growth from solution at a rate of 1.6 sec/frame. Finally, Chapter 5 explores in detail a biophysics problem that motivates us to develop fast, quiet, and gentle microscopes; namely, the control of crystal growth in seashells by the action of soluble proteins on a growing calcite surface.

  13. Application of advanced computational technology to propulsion CFD

    NASA Astrophysics Data System (ADS)

    Szuch, John R.

    The Internal Fluid Mechanics Division of the NASA Lewis Research Center is combining the key elements of computational fluid dynamics, aerothermodynamic experiments, and advanced computational technology to bring internal computational fluid dynamics (ICFM) to a state of practical application for aerospace propulsion system design. This paper presents an overview of efforts underway at NASA Lewis to advance and apply computational technology to ICFM. These efforts include the use of modern, software engineering principles for code development, the development of an AI-based user-interface for large codes, the establishment of a high-performance, data communications network to link ICFM researchers and facilities, and the application of parallel processing to speed up computationally intensive and/or time-critical ICFM problems. A multistage compressor flow physics program is cited as an example of efforts to use advanced computational technology to enhance a current NASA Lewis ICFM research program.

  14. Diverse applications of advanced man-telerobot interfaces

    NASA Technical Reports Server (NTRS)

    Mcaffee, Douglas A.

    1991-01-01

    Advancements in man-machine interfaces and control technologies used in space telerobotics and teleoperators have potential application wherever human operators need to manipulate multi-dimensional spatial relationships. Bilateral six degree-of-freedom position and force cues exchanged between the user and a complex system can broaden and improve the effectiveness of several diverse man-machine interfaces.

  15. Application of advanced technologies to future military transports

    NASA Technical Reports Server (NTRS)

    Clark, Rodney L.; Lange, Roy H.; Wagner, Richard D.

    1990-01-01

    Long range military transport technologies are addressed with emphasis of defining the potential benefits of the hybrid laminar flow control (HLFC) concept currently being flight tested. Results of a 1990's global range transport study are presented showing the expected payoff from application of advanced technologies. Technology forecast for military transports is also presented.

  16. Tele-Immersion: An Internet 2 Advanced Application.

    ERIC Educational Resources Information Center

    Simco, Greg

    2000-01-01

    Describes Tele-Immersion, and Advanced Applications initiative of the Internet 2 to develop group collaboration and interactivity beyond the current practices of the Internet. Discusses research areas that relate to this realm of virtual reality, including depth perception and rendering, which maps digital representations to a human compatible…

  17. Nanostructure patterning on flexible substrates using electron beam lithography

    NASA Astrophysics Data System (ADS)

    Nagaraj, K. S.; Sangeeth, K.; Hegde, G. M.

    2014-06-01

    Patterning nanostructures on flexible substrates plays a key role in the emerging flexible electronics technology. The flexible electronic devices are inexpensive and can be conformed to any shape. The potential applications for such devices are sensors, displays, solar cells, RFID, high-density biochips, optoelectronics etc. E-beam lithography is established as a powerful tool for nanoscale fabrication, but its applicability on insulating flexible substrates is often limited because of surface charging effects. This paper presents the fabrication of nanostructures on insulating flexible substrates using low energy E-beam lithography along with metallic layers for charge dissipation. Nano Structures are patterned on different substrates of materials such as acetate and PET foils. The fabrication process parameters such as the proximity gap of exposure, the exposure dosage and developing conditions have been optimized for each substrate.

  18. Discharge produced plasma source for EUV lithography

    NASA Astrophysics Data System (ADS)

    Borisov, V.; Eltzov, A.; Ivanov, A.; Khristoforov, O.; Kirykhin, Yu.; Vinokhodov, A.; Vodchits, V.; Mishhenko, V.; Prokofiev, A.

    2007-04-01

    Extreme ultraviolet (EUV) radiation is seen as the most promising candidate for the next generation of lithography and semiconductor chip manufacturing for the 32 nm node and below. The paper describes experimental results obtained with discharge produced plasma (DPP) sources based on pinch effect in a Xe and Sn vapour as potential tool for the EUV lithography. Problems of DPP source development are discussed.

  19. A survey of advanced battery systems for space applications

    NASA Astrophysics Data System (ADS)

    Attia, Alan I.

    1989-12-01

    The results of a survey on advanced secondary battery systems for space applications are presented. The objectives were: to identify advanced battery systems capable of meeting the requirements of various types of space missions, with significant advantages over currently available batteries, to obtain an accurate estimate of the anticipated improvements of these advanced systems, and to obtain a consensus for the selection of systems most likely to yield the desired improvements. Few advanced systems are likely to exceed a specific energy of 150 Wh/kg and meet the additional requirements of safety and reliability within the next 15 years. The few that have this potential are: (1) regenerative fuel cells, both alkaline and solid polymer electrolyte (SPE) types for large power systems; (2) lithium-intercalatable cathodes, particularly the metal ozides intercalatable cathodes (MnO2 or CoO2), with applications limited to small spacecrafts requiring limited cycle life and low power levels; (3) lithium molten salt systems (e.g., LiAl-FeS2); and (4) Na/beta Alumina/Sulfur or metal chlorides cells. Likely technological advances that would enhance the performance of all the above systems are also identified, in particular: improved bifunctional oxygen electrodes; improved manufacturing technology for thin film lithium electrodes in combination with polymeric electrolytes; improved seals for the lithium molten salt cells; and improved ceramics for sodium/solid electrolyte cells.

  20. A survey of advanced battery systems for space applications

    NASA Technical Reports Server (NTRS)

    Attia, Alan I.

    1989-01-01

    The results of a survey on advanced secondary battery systems for space applications are presented. The objectives were: to identify advanced battery systems capable of meeting the requirements of various types of space missions, with significant advantages over currently available batteries, to obtain an accurate estimate of the anticipated improvements of these advanced systems, and to obtain a consensus for the selection of systems most likely to yield the desired improvements. Few advanced systems are likely to exceed a specific energy of 150 Wh/kg and meet the additional requirements of safety and reliability within the next 15 years. The few that have this potential are: (1) regenerative fuel cells, both alkaline and solid polymer electrolyte (SPE) types for large power systems; (2) lithium-intercalatable cathodes, particularly the metal ozides intercalatable cathodes (MnO2 or CoO2), with applications limited to small spacecrafts requiring limited cycle life and low power levels; (3) lithium molten salt systems (e.g., LiAl-FeS2); and (4) Na/beta Alumina/Sulfur or metal chlorides cells. Likely technological advances that would enhance the performance of all the above systems are also identified, in particular: improved bifunctional oxygen electrodes; improved manufacturing technology for thin film lithium electrodes in combination with polymeric electrolytes; improved seals for the lithium molten salt cells; and improved ceramics for sodium/solid electrolyte cells.

  1. Advances in Multi-Sensor Data Fusion: Algorithms and Applications

    PubMed Central

    Dong, Jiang; Zhuang, Dafang; Huang, Yaohuan; Fu, Jingying

    2009-01-01

    With the development of satellite and remote sensing techniques, more and more image data from airborne/satellite sensors have become available. Multi-sensor image fusion seeks to combine information from different images to obtain more inferences than can be derived from a single sensor. In image-based application fields, image fusion has emerged as a promising research area since the end of the last century. The paper presents an overview of recent advances in multi-sensor satellite image fusion. Firstly, the most popular existing fusion algorithms are introduced, with emphasis on their recent improvements. Advances in main applications fields in remote sensing, including object identification, classification, change detection and maneuvering targets tracking, are described. Both advantages and limitations of those applications are then discussed. Recommendations are addressed, including: (1) Improvements of fusion algorithms; (2) Development of “algorithm fusion” methods; (3) Establishment of an automatic quality assessment scheme. PMID:22408479

  2. Advanced MR Imaging in Pediatric Brain Tumors, Clinical Applications.

    PubMed

    Lequin, Maarten; Hendrikse, Jeroen

    2017-02-01

    Advanced MR imaging techniques, such as spectroscopy, perfusion, diffusion, and functional imaging, have improved the diagnosis of brain tumors in children and also play an important role in defining surgical as well as therapeutic responses in these patients. In addition to the anatomic or structural information gained with conventional MR imaging sequences, advanced MR imaging techniques also provide physiologic information about tumor morphology, metabolism, and hemodynamics. This article reviews the physiology, techniques, and clinical applications of diffusion-weighted and diffusion tensor imaging, MR spectroscopy, perfusion MR imaging, susceptibility-weighted imaging, and functional MR imaging in the setting of neuro-oncology.

  3. Advanced ceramic materials for next-generation nuclear applications

    NASA Astrophysics Data System (ADS)

    Marra, John

    2011-10-01

    The nuclear industry is at the eye of a 'perfect storm' with fuel oil and natural gas prices near record highs, worldwide energy demands increasing at an alarming rate, and increased concerns about greenhouse gas (GHG) emissions that have caused many to look negatively at long-term use of fossil fuels. This convergence of factors has led to a growing interest in revitalization of the nuclear power industry within the United States and across the globe. Many are surprised to learn that nuclear power provides approximately 20% of the electrical power in the US and approximately 16% of the world-wide electric power. With the above factors in mind, world-wide over 130 new reactor projects are being considered with approximately 25 new permit applications in the US. Materials have long played a very important role in the nuclear industry with applications throughout the entire fuel cycle; from fuel fabrication to waste stabilization. As the international community begins to look at advanced reactor systems and fuel cycles that minimize waste and increase proliferation resistance, materials will play an even larger role. Many of the advanced reactor concepts being evaluated operate at high-temperature requiring the use of durable, heat-resistant materials. Advanced metallic and ceramic fuels are being investigated for a variety of Generation IV reactor concepts. These include the traditional TRISO-coated particles, advanced alloy fuels for 'deep-burn' applications, as well as advanced inert-matrix fuels. In order to minimize wastes and legacy materials, a number of fuel reprocessing operations are being investigated. Advanced materials continue to provide a vital contribution in 'closing the fuel cycle' by stabilization of associated low-level and high-level wastes in highly durable cements, ceramics, and glasses. Beyond this fission energy application, fusion energy will demand advanced materials capable of withstanding the extreme environments of high

  4. Mask lithography for display manufacturing

    NASA Astrophysics Data System (ADS)

    Sandstrom, T.; Ekberg, P.

    2010-05-01

    The last ten years have seen flat displays conquer our briefcases, desktops, and living rooms. There has been an enormous development in production technology, not least in lithography and photomasks. Current masks for large displays are more than 2 m2 and make 4-6 1X prints on glass substrates that are 9 m2. One of the most challenging aspects of photomasks for displays is the so called mura, stripes or blemishes which cause visible defects in the finished display. For the future new and even tighter maskwriter specifications are driven by faster transistors and more complex pixel layouts made necessary by the market's wish for still better image quality, multi-touch panels, 3D TVs, and the next wave of e-book readers. Large OLED screens will pose new challenges. Many new types of displays will be lowcost and use simple lithography, but anything which can show video and high quality photographic images needs a transistor backplane and sophisticated masks for its production.

  5. A combined electron beam/optical lithography process step for the fabrication of sub-half-micron-gate-length MMIC chips

    NASA Astrophysics Data System (ADS)

    Sewell, James S.; Bozada, Christopher A.

    1994-02-01

    Advanced radar and communication systems rely heavily on state-of-the-art microelectronics. Systems such as the phased-array radar require many transmit/receive (T/R) modules which are made up of many millimeter wave - microwave integrated circuits (MMIC's). The heart of a MMIC chip is the Gallium Arsenide (GaAs) field-effect transistor (FET). The transistor gate length is the critical feature that determines the operating frequency of the radar system. A smaller gate length will typically result in a higher frequency. In order to make a phased array radar system economically feasible, manufacturers must be capable of producing very large quantities of small-gate-length MMIC chips at a relatively low cost per chip. This requires the processing of a large number of wafers with a large number of chips per wafer, minimum processing time, and a very high chip yield. One of the bottlenecks in the fabrication of MIMIC chips is the transistor gate definition. The definition of sub-half-micron gates for GaAs-based field-effect transistors is generally performed by direct-write electron beam lithography (EBL). Because of the throughput limitations of EBL, the gate-layer fabrication is conventionally divided into two lithographic processes where EBL is used to generate the gate fingers and optical lithography is used to generate the large-area gate pads and interconnects. As a result, two complete sequences of resist application, exposure, development, metallization and lift-off are required for the entire gate structure. We have baselined a hybrid process, referred to as EBOL (electron beam/optical lithography), in which a single application of a multi-level resist is used for both exposures. The entire gate structure, (gate fingers, interconnects and pads), is then formed with a single metallization and lift-off process. The EBOL process thus retains the advantages of the high-resolution E-beam lithography and the high throughput of optical lithography while essentially

  6. A combined electron beam/optical lithography process step for the fabrication of sub-half-micron-gate-length MMIC chips

    NASA Technical Reports Server (NTRS)

    Sewell, James S.; Bozada, Christopher A.

    1994-01-01

    Advanced radar and communication systems rely heavily on state-of-the-art microelectronics. Systems such as the phased-array radar require many transmit/receive (T/R) modules which are made up of many millimeter wave - microwave integrated circuits (MMIC's). The heart of a MMIC chip is the Gallium Arsenide (GaAs) field-effect transistor (FET). The transistor gate length is the critical feature that determines the operating frequency of the radar system. A smaller gate length will typically result in a higher frequency. In order to make a phased array radar system economically feasible, manufacturers must be capable of producing very large quantities of small-gate-length MMIC chips at a relatively low cost per chip. This requires the processing of a large number of wafers with a large number of chips per wafer, minimum processing time, and a very high chip yield. One of the bottlenecks in the fabrication of MIMIC chips is the transistor gate definition. The definition of sub-half-micron gates for GaAs-based field-effect transistors is generally performed by direct-write electron beam lithography (EBL). Because of the throughput limitations of EBL, the gate-layer fabrication is conventionally divided into two lithographic processes where EBL is used to generate the gate fingers and optical lithography is used to generate the large-area gate pads and interconnects. As a result, two complete sequences of resist application, exposure, development, metallization and lift-off are required for the entire gate structure. We have baselined a hybrid process, referred to as EBOL (electron beam/optical lithography), in which a single application of a multi-level resist is used for both exposures. The entire gate structure, (gate fingers, interconnects and pads), is then formed with a single metallization and lift-off process. The EBOL process thus retains the advantages of the high-resolution E-beam lithography and the high throughput of optical lithography while essentially

  7. Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography

    NASA Astrophysics Data System (ADS)

    Yamashita, T.; Ishikawa, T.; Yoshida, T.; Hayamai, T.; Araki, Takayuki; Aoyama, H.; Hagiwara, T.; Itani, Toshiro; Fujii, Kiyoshi

    2005-05-01

    Various fluorinated polymers were synthesized for application in 193-nm immersion lithography with the goal of improving 157-nm photoresist performance. Their fundamental properties were characterized, such as transparency at 193-nm and 157-nm (wavelength) and solubility in water and a standard alkaline developer. High transparency, i.e., absorbance better than 0.3 μm-1 at 193-nm wavelength, was achieved. The dissolution behaviors of them were studied by using the Quartz Crystal Microbalance (QCM) method. We find that the dissolution rate of Poly(norbornene-2-fluoro-2-hexafluoroalchol) (PNB1FVIP) in 0.065N tetramethylammonium hydroxide (TMAH) was >200 times (nm/s) faster than that of the copolymer of tetrafluoroethylene (TFE) and norbornene-2-fluoro-2-hexafluoroalchol (TFE/NB1FVIP). A resist based on TFE/NB1FVIP was able to delineate 75 nm dense lines by exposure at 193-nm (wavelength) with an alternating phase shift mask using a 0.75 NA ArF scanner. The dissolution rates of the fluoropolymers in water and a 0.262N and 0.065 TMAH can be controlled by optimizing counter monomers containing hexafluoroisopropanol (HFA) unit, carboxylic acid unit and so on. In addition, we have collect water contact angle data. This data shows that fluoropolymers can be used as resist cover materials for 193-nm immersion lithography.

  8. Development of an advanced photovoltaic concentrator system for space applications

    NASA Technical Reports Server (NTRS)

    Piszczor, Michael F., Jr.; Oneill, Mark J.

    1987-01-01

    Recent studies indicate that significant increases in system performance (increased efficiency and reduced system mass) are possible for high power space based systems by incorporating technological developments with photovoltaic power systems. The Advanced Photovoltaic Concentrator Program is an effort to take advantage of recent advancements in refractive optical elements. By using a domed Fresnel lens concentrator and a prismatic cell cover, to eliminate metallization losses, dramatic reductions in the required area and mass over current space photovoltaic systems are possible. The advanced concentrator concept also has significant advantages when compared to solar dynamic Organic Rankine Cycle power systems in Low Earth Orbit applications where energy storage is required. The program is currently involved in the selection of a material for the optical element that will survive the space environment and a demonstration of the system performance of the panel design.

  9. Recent advances in processing and applications of microwave ferrites

    NASA Astrophysics Data System (ADS)

    Harris, Vincent G.; Geiler, Anton; Chen, Yajie; Yoon, Soack Dae; Wu, Mingzhong; Yang, Aria; Chen, Zhaohui; He, Peng; Parimi, Patanjali V.; Zuo, Xu; Patton, Carl E.; Abe, Manasori; Acher, Olivier; Vittoria, Carmine

    2009-07-01

    Next generation magnetic microwave devices will be planar, smaller, weigh less, and perform well beyond the present state-of-the-art. For this to become a reality advances in ferrite materials must first be realized. These advances include self-bias magnetization, tunability of the magnetic anisotropy, low microwave loss, and volumetric and weight reduction. To achieve these goals one must turn to novel materials processing methods. Here, we review recent advances in the processing of microwave ferrites. Attention is paid to the processing of ferrite films by pulsed laser deposition, liquid phase epitaxy, spin spray ferrite plating, screen printing, and compaction of quasi-single crystals. Conventional and novel applications of ferrite materials, including microwave non-reciprocal passive devices, microwave signal processing, negative index metamaterial-based electronics, and electromagnetic interference suppression are discussed.

  10. Advanced Turbine Technology Applications Project (ATTAP). Annual report 1992

    SciTech Connect

    Not Available

    1993-03-01

    This report summarizes work performed by Garrett Auxiliary Power Division (GAPD), a unit of Allied-Signal Aerospace Company, during calendar year 1992, toward development and demonstration of structural ceramic technology for automotive gas turbine engines. This work was performed for the US Department of Energy (DOE) under National Aeronautics and Space Administration (NASA) Contract DEN3-335, Advanced Turbine Technology Applications Project (ATTAP). GAPD utilized the AGT101 regenerated gas turbine engine developed under the previous DOE/NASA Advanced Gas Turbine (AGT) program as the ATTAP test bed for ceramic engine technology demonstration. ATTAP focussed on improving AGT101 test bed reliability, development of ceramic design methodologies, and improvement of fabrication and materials processing technology by domestic US ceramics fabricators. A series of durability tests was conducted to verify technology advancements. This is the fifth in a series of technical summary reports published annually over the course of the five-year contract.

  11. Advanced boundary layer transition measurement methods for flight applications

    NASA Technical Reports Server (NTRS)

    Holmes, B. J.; Croom, C. C.; Gail, P. D.; Manuel, G. S.; Carraway, D. L.

    1986-01-01

    In modern laminar flow flight research, it is important to understand the specific cause(s) of laminar to turbulent boundary-layer transition. Such information is crucial to the exploration of the limits of practical application of laminar flow for drag reduction on aircraft. The transition modes of interest in current flight investigations include the viscous Tollmien-Schlichting instability, the inflectional instability at laminar separation, and the crossflow inflectional instability, as well as others. This paper presents the results to date of research on advanced devices and methods used for the study of laminar boundary-layer transition phenomena in the flight environment. Recent advancements in the development of arrayed hot-film devices and of a new flow visualization method are discussed. Arrayed hot-film devices have been designed to detect the presence of laminar separation, and of crossflow vorticity. The advanced flow visualization method utilizes color changes in liquid-crystal coatings to detect boundary-layer transition at high altitude flight conditions. Flight and wind tunnel data are presented to illustrate the design and operation of these advanced methods. These new research tools provide information on disturbance growth and transition mode which is essential to furthering our understanding of practical design limits for applications of laminar flow technology.

  12. Advanced stress analysis methods applicable to turbine engine structures

    NASA Technical Reports Server (NTRS)

    Pian, T. H. H.

    1985-01-01

    Advanced stress analysis methods applicable to turbine engine structures are investigated. Constructions of special elements which containing traction-free circular boundaries are investigated. New versions of mixed variational principle and version of hybrid stress elements are formulated. A method is established for suppression of kinematic deformation modes. semiLoof plate and shell elements are constructed by assumed stress hybrid method. An elastic-plastic analysis is conducted by viscoplasticity theory using the mechanical subelement model.

  13. Characteristics and applications of advanced technology microchannel plates

    NASA Astrophysics Data System (ADS)

    Horton, J. R.; Tasker, G. W.; Fijol, J. J.

    1990-09-01

    A method for fabrication of novel thin-film continuous dynode electron multipliers is described. The feasibility of crucial manufacturing steps, including anisotropic dry etching of substrates into photolithographically-defined arrays of high-aspect-ratio channels, and the formation of thin-film continuous dynodes by CVD is shown. Potential performance and design advantages of this advanced technology-microchannel plate over the conventional reduced lead silicate glass microchannel plate and implications for new applications are discussed.

  14. Continuously variable transmission: Assessment of applicability to advance electric vehicles

    NASA Technical Reports Server (NTRS)

    Loewenthal, S. H.; Parker, R. J.

    1981-01-01

    A brief historical account of the evolution of continuously variable transmissions (CVT) for automotive use is given. The CVT concepts which are potentially suitable for application with electric and hybrid vehicles are discussed. The arrangement and function of several CVT concepts are cited along with their current developmental status. The results of preliminary design studies conducted on four CVT concepts for use in advanced electric vehicles are discussed.

  15. Rapid prototyping of microstructures by soft lithography for biotechnology.

    PubMed

    Wolfe, Daniel B; Qin, Dong; Whitesides, George M

    2010-01-01

    This chapter describes the methods and specific procedures used to fabricate microstructures by soft lithography. These techniques are useful for the prototyping of devices useful for applications in biotechnology. Fabrication by soft lithography does not require specialized or expensive equipment; the materials and facilities necessary are found commonly in biological and chemical laboratories in both academia and industry. The combination of the fact that the materials are low-cost and that the time from design to prototype device can be short (< 24 h) makes it possible to use and to screen rapidly devices that also can be disposable. Here we describe the procedures for fabricating microstructures with lateral dimensions as small as 1 mum. These types of microstructures are useful for microfluidic devices, cell-based assays, and bioengineered surfaces.

  16. Source development for extreme ultraviolet lithography and water window imaging

    NASA Astrophysics Data System (ADS)

    O'Sullivan, G.; Dunne, P.; Kilbane, D.; Liu, L.; Lokasani, R.; Long, E.; Li, B. W.; McCormack, T.; O'Reilly, F.; Shiel, J.; Sokell, E.; Suzuki, C.; Wu, T.; Higashiguchi, T.

    2017-03-01

    Sources based on laser produced plasmas of tin (Sn) are currently being developed for extreme ultraviolet lithography for semiconductor fabrication. Since they operate at short wavelength (13.5 nm) they are capable of producing features with critical dimensions in the 10 nm range. Already next generation lithography sources operating at an even lower wavelength of around 6.7-6.8 nm have been proposed and research is ongoing on their feasibility for both large scale manufacturing and `at wavelength' metrology. The high resolution afforded by such short wavelengths is also of use for applications such as surface patterning and microscopy and the results of recent experiments to identify sources for operation in the `water window' (2.34-4.2 nm), where carbon absorbs strongly but water does not are summarized.

  17. Recent Advances in Computed Tomographic Technology: Cardiopulmonary Imaging Applications.

    PubMed

    Tabari, Azadeh; Lo Gullo, Roberto; Murugan, Venkatesh; Otrakji, Alexi; Digumarthy, Subba; Kalra, Mannudeep

    2017-03-01

    Cardiothoracic diseases result in substantial morbidity and mortality. Chest computed tomography (CT) has been an imaging modality of choice for assessing a host of chest diseases, and technologic advances have enabled the emergence of coronary CT angiography as a robust noninvasive test for cardiac imaging. Technologic developments in CT have also enabled the application of dual-energy CT scanning for assessing pulmonary vascular and neoplastic processes. Concerns over increasing radiation dose from CT scanning are being addressed with introduction of more dose-efficient wide-area detector arrays and iterative reconstruction techniques. This review article discusses the technologic innovations in CT and their effect on cardiothoracic applications.

  18. Survey of advanced nuclear technologies for potential applications of sonoprocessing.

    PubMed

    Rubio, Floren; Blandford, Edward D; Bond, Leonard J

    2016-09-01

    Ultrasonics has been used in many industrial applications for both sensing at low power and processing at higher power. Generally, the high power applications fall within the categories of liquid stream degassing, impurity separation, and sonochemical enhancement of chemical processes. Examples of such industrial applications include metal production, food processing, chemical production, and pharmaceutical production. There are many nuclear process streams that have similar physical and chemical processes to those applications listed above. These nuclear processes could potentially benefit from the use of high-power ultrasonics. There are also potential benefits to applying these techniques in advanced nuclear fuel cycle processes, and these benefits have not been fully investigated. Currently the dominant use of ultrasonic technology in the nuclear industry has been using low power ultrasonics for non-destructive testing/evaluation (NDT/NDE), where it is primarily used for inspections and for characterizing material degradation. Because there has been very little consideration given to how sonoprocessing can potentially improve efficiency and add value to important process streams throughout the nuclear fuel cycle, there are numerous opportunities for improvement in current and future nuclear technologies. In this paper, the relevant fundamental theory underlying sonoprocessing is highlighted, and some potential applications to advanced nuclear technologies throughout the nuclear fuel cycle are discussed.

  19. Advances in Production and Applications of Carbon Nanotubes.

    PubMed

    Jia, Xilai; Wei, Fei

    2017-02-01

    Recent decades have witnessed many breakthroughs in research on carbon nanotubes (CNTs), particularly regarding controllable synthesis, production scale-up, and application advances for this material. This sp (2)-bonded nanocarbon uniquely combines extreme mechanical strength, exceptionally high electrical conductivity, as well as many other superior properties, making it highly attractive for fundamental research and industrial applications. Synthesis and mass production form the solid basis for high-volume applications of CNTs. During recent decades, CNT production capacity has reached more than thousands of tons per year, greatly decreasing the price of CNTs. Although the unique physiochemical properties of an individual CNT are stated repeatedly, manifestation of such unique properties in a macroscopic material, e.g., realization of high-strength CNT fibers, remains a great challenge. If such challenges are solved, many critical applications will be enabled. Herein we review the critical progress in the development of synthesis and scaled-up production methods for CNTs, and discuss advances in their applications. Scientific problems and technological challenges are discussed together.

  20. Advances in the manufacturing, types, and applications of biosensors

    NASA Astrophysics Data System (ADS)

    Ravindra, Nuggehalli M.; Prodan, Camelia; Fnu, Shanmugamurthy; Padronl, Ivan; Sikha, Sushil K.

    2007-12-01

    In recent years, there have been significant technological advancements in the manufacturing, types, and applications of biosensors. Applications include clinical and non-clinical diagnostics for home, bio-defense, bio-remediation, environment, agriculture, and the food industry. Biosensors have progressed beyond the detection of biological threats such as anthrax and are finding use in a number of non-biological applications. Emerging biosensor technologies such as lab-on-a-chip have revolutionized the integration approaches for a very flexible, innovative, and user-friendly platform. An overview of the fundamentals, types, applications, and manufacturers, as well as the market trends of biosensors is presented here. Two case studies are discussed: one focused on a characterization technique—patch clamping and dielectric spectroscopy as a biological sensor—and the other about lithium phthalocyanine, a material that is being developed for in-vivo oxymetry.

  1. Multi-shaped-beam (MSB): an evolutionary approach for high throughput e-beam lithography

    NASA Astrophysics Data System (ADS)

    Slodowski, Matthias; Döring, Hans-Joachim; Stolberg, Ines A.; Dorl, Wolfgang

    2010-09-01

    The development of next-generation lithography (NGL) such as EUV, NIL and maskless lithography (ML2) are driven by the half pitch reduction and increasing integration density of integrated circuits down to the 22nm node and beyond. For electron beam direct write (EBDW) several revolutionary pixel based concepts have been under development since several years. By contrast an evolutionary and full package high throughput multi electron-beam approach called Multi Shaped Beam (MSB), which is based on proven Variable Shaped Beam (VSB) technology, will be presented in this paper. In the recent decade VSB has already been applied in EBDW for device learning, early prototyping and low volume fabrication in production environments for both silicon and compound semiconductor applications. Above all the high resolution and the high flexibility due to the avoidance of expensive masks for critical layers made it an attractive solution for advanced technology nodes down to 32nm half pitch. The limitation in throughput of VSB has been mitigated in a major extension of VSB by the qualification of the cell projection (CP) technology concurrently used with VSB. With CP more pixels in complex shapes can be projected in one shot, enabling a remarkable shot count reduction for repetitive pattern. The most advanced step to extend the mature VSB technology for higher throughput is its parallelization in one column applying MEMS based multi deflection arrays. With this Vistec MSB technology, multiple shaped beamlets are generated simultaneously, each controllable individually in shape size and beam on time. Compared to pixel based ML2 approaches the MSB technology enables the maskless, variable and parallel projection of a large number of pixels per beamlet times the number of beamlets. Basic concepts, exposure examples and performance results of each of the described throughput enhancement steps will be presented.

  2. Optimization of X-ray sources from a high-average-power ND:Glass laser-produced plasma for proximity lithography

    SciTech Connect

    Celliers, P.; Da Silva, L.B.; Dane, C.B.

    1996-06-01

    The concept of a laser-based proximity lithography system for electronic microcircuit production has advanced to the point where a detailed design of a prototype system capable of exposing wafers at 40 wafer levels per hr is technically feasible with high-average-power laser technology. In proximity x-ray lithography, a photoresist composed of polymethyl- methacrylate (PMMA) or similar material is exposed to x rays transmitted through a mask placed near the photoresist, a procedure which is similar to making a photographic contact print. The mask contains a pattern of opaque metal features, with line widths as small as 0.12 {mu}m, placed on a thin (1-{mu}m thick) Si membrane. During the exposure, the shadow of the mask projected onto the resist produces in the physical and chemical properties of the resist a pattern of variation with the same size and shape as the features contained in the metal mask. This pattern can be further processed to produce microscopic structures in the Si substrate. The main application envisioned for this technology is the production of electronic microcircuits with spatial features significantly smaller than currently achievable with conventional optical lithographic techniques (0.12 {micro}m vs 0.25 {micro}m). This article describes work on optimizing a laser-produced plasma x-ray source intended for microcircuit production by proximity lithography.

  3. Smartphone Sensors for Stone Lithography Authentication

    PubMed Central

    Schirripa Spagnolo, Giuseppe; Cozzella, Lorenzo; Papalillo, Donato

    2014-01-01

    Nowadays mobile phones include quality photo and video cameras, access to wireless networks and the internet, GPS assistance and other innovative systems. These facilities open them to innovative uses, other than the classical telephonic communication one. Smartphones are a more sophisticated version of classic mobile phones, which have advanced computing power, memory and connectivity. Because fake lithographs are flooding the art market, in this work, we propose a smartphone as simple, robust and efficient sensor for lithograph authentication. When we buy an artwork object, the seller issues a certificate of authenticity, which contains specific details about the artwork itself. Unscrupulous sellers can duplicate the classic certificates of authenticity, and then use them to “authenticate” non-genuine works of art. In this way, the buyer will have a copy of an original certificate to attest that the “not original artwork” is an original one. A solution for this problem would be to insert a system that links together the certificate and the related specific artwork. To do this it is necessary, for a single artwork, to find unique, unrepeatable, and unchangeable characteristics. In this article we propose an innovative method for the authentication of stone lithographs. We use the color spots distribution captured by means of a smartphone camera as a non-cloneable texture of the specific artworks and an information management system for verifying it in mobility stone lithography. PMID:24811077

  4. Fabricating Blazed Diffraction Gratings by X-Ray Lithography

    NASA Technical Reports Server (NTRS)

    Mouroulis, Pantazis; Hartley, Frank; Wilson, Daniel

    2004-01-01

    Gray-scale x-ray lithography is undergoing development as a technique for fabricating blazed diffraction gratings. As such, gray-scale x-ray lithography now complements such other grating-fabrication techniques as mechanical ruling, holography, ion etching, laser ablation, laser writing, and electron-beam lithography. Each of these techniques offers advantages and disadvantages for implementing specific grating designs; no single one of these techniques can satisfy the design requirements for all applications. Gray-scale x-ray lithography is expected to be advantageous for making gratings on steeper substrates than those that can be made by electron-beam lithography. This technique is not limited to sawtooth groove profiles and flat substrates: various groove profiles can be generated on arbitrarily shaped (including highly curved) substrates with the same ease as sawtooth profiles can be generated on flat substrates. Moreover, the gratings fabricated by this technique can be made free of ghosts (spurious diffraction components attributable to small spurious periodicities in the locations of grooves). The first step in gray-scale x-ray lithography is to conformally coat a substrate with a suitable photoresist. An x-ray mask (see Figure 1) is generated, placed between the substrate and a source of collimated x-rays, and scanned over the substrate so as to create a spatial modulation in the exposure of the photoresist. Development of the exposed photoresist results in a surface corrugation that corresponds to the spatial modulation and that defines the grating surface. The grating pattern is generated by scanning an appropriately shaped x-ray area mask along the substrate. The mask example of Figure 1 would generate a blazed grating profile when scanned in the perpendicular direction at constant speed, assuming the photoresist responds linearly to incident radiation. If the resist response is nonlinear, then the mask shape can be modified to account for the

  5. Particle Lithography Enables Fabrication of Multicomponent Nanostructures

    PubMed Central

    Lin, Wei-feng; Swartz, Logan A.; Li, Jie-Ren; Liu, Yang; Liu, Gang-yu

    2014-01-01

    Multicomponent nanostructures with individual geometries have attracted much attention because of their potential to carry out multiple functions synergistically. The current work reports a simple method using particle lithography to fabricate multicomponent nanostructures of metals, proteins, and organosiloxane molecules, each with its own geometry. Particle lithography is well-known for its capability to produce arrays of triangular-shaped nanostructures with novel optical properties. This paper extends the capability of particle lithography by combining a particle template in conjunction with surface chemistry to produce multicomponent nanostructures. The advantages and limitations of this approach will also be addressed. PMID:24707328

  6. Applications and Advances in Electronic-Nose Technologies

    PubMed Central

    Wilson, Alphus D.; Baietto, Manuela

    2009-01-01

    Electronic-nose devices have received considerable attention in the field of sensor technology during the past twenty years, largely due to the discovery of numerous applications derived from research in diverse fields of applied sciences. Recent applications of electronic nose technologies have come through advances in sensor design, material improvements, software innovations and progress in microcircuitry design and systems integration. The invention of many new e-nose sensor types and arrays, based on different detection principles and mechanisms, is closely correlated with the expansion of new applications. Electronic noses have provided a plethora of benefits to a variety of commercial industries, including the agricultural, biomedical, cosmetics, environmental, food, manufacturing, military, pharmaceutical, regulatory, and various scientific research fields. Advances have improved product attributes, uniformity, and consistency as a result of increases in quality control capabilities afforded by electronic-nose monitoring of all phases of industrial manufacturing processes. This paper is a review of the major electronic-nose technologies, developed since this specialized field was born and became prominent in the mid 1980s, and a summarization of some of the more important and useful applications that have been of greatest benefit to man. PMID:22346690

  7. Feature-based tolerancing for advanced manufacturing applications

    SciTech Connect

    Brown, C.W.; Kirk, W.J. III; Simons, W.R.; Ward, R.C.; Brooks, S.L.

    1994-11-01

    A primary requirement for the successful deployment of advanced manufacturing applications is the need for a complete and accessible definition of the product. This product definition must not only provide an unambiguous description of a product`s nominal shape but must also contain complete tolerance specification and general property attributes. Likewise, the product definition`s geometry, topology, tolerance data, and modeler manipulative routines must be fully accessible through a robust application programmer interface. This paper describes a tolerancing capability using features that complements a geometric solid model with a representation of conventional and geometric tolerances and non-shape property attributes. This capability guarantees a complete and unambiguous definition of tolerances for manufacturing applications. An object-oriented analysis and design of the feature-based tolerance domain was performed. The design represents and relates tolerance features, tolerances, and datum reference frames. The design also incorporates operations that verify correctness and check for the completeness of the overall tolerance definition. The checking algorithm is based upon the notion of satisfying all of a feature`s toleranceable aspects. Benefits from the feature-based tolerance modeler include: advancing complete product definition initiatives, incorporating tolerances in product data exchange, and supplying computer-integrated manufacturing applications with tolerance information.

  8. Advances in computer imaging/applications in facial plastic surgery.

    PubMed

    Papel, I D; Jiannetto, D F

    1999-01-01

    Rapidly progressing computer technology, ever-increasing expectations of patients, and a confusing medicolegal environment requires a clarification of the role of computer imaging/applications. Advances in computer technology and its applications are reviewed. A brief historical discussion is included for perspective. Improvements in both hardware and software with the advent of digital imaging have allowed great increases in speed and accuracy in patient imaging. This facilitates doctor-patient communication and possibly realistic patient expectations. Patients seeking cosmetic surgery now often expect preoperative imaging. Although society in general has become more litigious, a literature search up to 1998 reveals no lawsuits directly involving computer imaging. It appears that conservative utilization of computer imaging by the facial plastic surgeon may actually reduce liability and promote communication. Recent advances have significantly enhanced the value of computer imaging in the practice of facial plastic surgery. These technological advances in computer imaging appear to contribute a useful technique for the practice of facial plastic surgery. Inclusion of computer imaging should be given serious consideration as an adjunct to clinical practice.

  9. High-power disk lasers: advances and applications

    NASA Astrophysics Data System (ADS)

    Havrilla, David; Ryba, Tracey; Holzer, Marco

    2012-03-01

    Though the genesis of the disk laser concept dates to the early 90's, the disk laser continues to demonstrate the flexibility and the certain future of a breakthrough technology. On-going increases in power per disk, and improvements in beam quality and efficiency continue to validate the genius of the disk laser concept. As of today, the disk principle has not reached any fundamental limits regarding output power per disk or beam quality, and offers numerous advantages over other high power resonator concepts, especially over monolithic architectures. With about 2,000 high power disk lasers installations, and a demand upwards of 1,000 lasers per year, the disk laser has proven to be a robust and reliable industrial tool. With advancements in running cost, investment cost and footprint, manufacturers continue to implement disk laser technology with more vigor than ever. This paper will explain recent advances in disk laser technology and process relevant features of the laser, like pump diode arrangement, resonator design and integrated beam guidance. In addition, advances in applications in the thick sheet area and very cost efficient high productivity applications like remote welding, remote cutting and cutting of thin sheets will be discussed.

  10. Nanoscience and Nanotechnology: From Energy Applications to Advanced Medical Therapies

    ScienceCinema

    Tijana Rajh

    2016-07-12

    Dr. Rajh will present a general talk on nanotechnology – an overview of why nanotechnology is important and how it is useful in various fields. The specific focus will be on Solar energy conversion, environmental applications and advanced medical therapies. She has broad expertise in synthesis and characterization of nanomaterials that are used in nanotechnology including novel hybrid systems connecting semiconductors to biological molecules like DNA and antibodies. This technology could lead to new gene therapy procedures, cancer treatments and other medical applications. She will also discuss technologies made possible by organizing small semiconductor particles called quantum dots, materials that exhibit a rich variety of phenomena that are size and shape dependent. Development of these new materials that harnesses the unique properties of materials at the 1-100 nanometer scale resulted in the new field of nanotechnology that currently affects many applications in technological and medical fields.

  11. Catheters: instrumental advancements in biomedical applications of optical fibers.

    PubMed

    de Lima, Carlos J; Moreira, Leonardo M; Lyon, Juliana P; Villaverde, Antonio B; Pacheco, Marcos T T

    2009-07-01

    This review is focused on the advancements in biomedical engineering regarding the elaboration of new prototypes of optical fiber catheters to be applied in spectroscopic analysis, such as Raman and fluorescence spectroscopy. Our group has contributed to the development of new prototypes with interesting properties, such as side-viewing signal excitation and collection, distal tip with bending control, and Raman scattering minimization from the optical fiber. In addition, several groups have contributed to other new catheter-improving properties of this spectroscopic device. However, a relatively small number of studies has been published in the literature, due to industrial interest in this interdisciplinary and multidisciplinary area. To our knowledge, no review that has focused on the applications of catheters to several modes of spectroscopy has been published. In this work we revised this topic, analyzing the advancements and limitations of the recent biomedical catheters.

  12. Synthetic Peptide templates for molecular recognition: recent advances and applications.

    PubMed

    Singh, Yashveer; Dolphin, Gunnar T; Razkin, Jesus; Dumy, Pascal

    2006-09-01

    The creation of molecular systems that can mimic some of the properties of natural macromolecules is one of the major endeavors in contemporary protein chemistry. However, the construction of artificial proteins with predetermined structure and function is difficult on account of complex folding pathways. The use of topological peptide templates has been suggested to induce and stabilize defined secondary and tertiary structures. This is because the recent advances in the chemistry of coupling reagents, protecting groups, and solid-phase synthesis have made the chemical synthesis of peptides with conformationally controlled and complex structures feasible. Besides their use as structure-inducing devices, these peptide templates can also be utilized to construct novel structures with tailor-made functions. Herein, we present recent advances in the field of peptide-template-based approaches with particular emphasis on the demonstrated utility of this approach in molecular recognition, along with related applications.

  13. Secrets of subwavelength imaging and lithography

    NASA Astrophysics Data System (ADS)

    Hemmer, Philip R.

    2011-08-01

    To understand the limits and tradeoffs of nearly all existing subwavelength imaging techniques it sufficient to understand magnetic resonance imaging (MRI) and its generalizations. In many cases, subwavelength optical lithography can be viewed as the inverse problem to imaging and so the same principles apply. A simple review of MRI is given which shows how the most popular subwavelength imaging and lithography techniques naturally arise as special cases.

  14. 90nm node contact hole patterning through applying model based OPC in KrF lithography

    NASA Astrophysics Data System (ADS)

    Jeon, Young-Doo; Lee, Sang-Uk; Choi, Jaeyoung; Kim, Jeahee; Han, Jaewon

    2008-03-01

    As semiconductor technologies move toward 90nm generation and below, contact hole is one of the most challenging features to print in the semiconductor manufacturing process. There are two principal difficulties in order to define small contact hole pattern on wafer. One is insufficient process margin besides poor resolution compared with line & space pattern. The other is that contact hole should be made through pitches and sometimes random contact hole pattern should be fabricated. Therefore advanced ArF lithography scanner should be used for small contact hole printing with RETs (Resolution Enhancement Techniques) such as immersion lithography, OPC(Optical Proximity Correction), PSM(Phase Shift Mask), high NA(Numerical Aperture), OAI(Off-Axis Illumination), SRAF(Sub-resolution Assistant Feature), mask biasing and thermal flow. Like this, ArF lithography propose the method of enhancing resolution, however, we must spend an enormous amount of CoC(cost of ownership) to utilize ArF photolithography process than KrF. In this paper, we suggest the method of contact holes patterning by using KrF lithography tool in 90nm sFlash(stand alone Flash)devices. For patterning of contact hole, we apply RETs which combine OAI and Model based OPC. Additionally, in this paper we present the result of hole pattern images which operate ArF lithography equipment. Also, this study describes comparison of two wafer images that ArF lithography process which is used mask biasing and Rule based OPC, KrF lithography process which is applied hybrid OPC.

  15. Advances in Electronic-Nose Technologies Developed for Biomedical Applications

    PubMed Central

    Wilson, Alphus D.; Baietto, Manuela

    2011-01-01

    The research and development of new electronic-nose applications in the biomedical field has accelerated at a phenomenal rate over the past 25 years. Many innovative e-nose technologies have provided solutions and applications to a wide variety of complex biomedical and healthcare problems. The purposes of this review are to present a comprehensive analysis of past and recent biomedical research findings and developments of electronic-nose sensor technologies, and to identify current and future potential e-nose applications that will continue to advance the effectiveness and efficiency of biomedical treatments and healthcare services for many years. An abundance of electronic-nose applications has been developed for a variety of healthcare sectors including diagnostics, immunology, pathology, patient recovery, pharmacology, physical therapy, physiology, preventative medicine, remote healthcare, and wound and graft healing. Specific biomedical e-nose applications range from uses in biochemical testing, blood-compatibility evaluations, disease diagnoses, and drug delivery to monitoring of metabolic levels, organ dysfunctions, and patient conditions through telemedicine. This paper summarizes the major electronic-nose technologies developed for healthcare and biomedical applications since the late 1980s when electronic aroma detection technologies were first recognized to be potentially useful in providing effective solutions to problems in the healthcare industry. PMID:22346620

  16. Gold Nanoparticles: Recent Advances in the Biomedical Applications.

    PubMed

    Zhang, Xiaoying

    2015-07-01

    Among the multiple branches of nanotechnology applications in the area of medicine and biology, Nanoparticle technology is the fastest growing and shows significant future promise. Nanoscale structures, with size similar to many biological molecules, show different physical and chemical properties compared to either small molecules or bulk materials, find many applications in the fields of biomedical imaging and therapy. Gold nanoparticles (AuNPs) are relatively inert in biological environment, and have a number of physical properties that are suitable for several biomedical applications. For example, AuNPs have been successfully employed in inducing localized hyperthermia for the destruction of tumors or radiotherapy for cancer, photodynamic therapy, computed tomography imaging, as drug carriers to tumors, bio-labeling through single particle detection by electron microscopy and in photothermal microscopy. Recent advances in synthetic chemistry makes it possible to make gold nanoparticles with precise control over physicochemical and optical properties that are desired for specific clinical or biological applications. Because of the availability of several methods for easy modification of the surface of gold nanoparticles for attaching a ligand, drug or other targeting molecules, AuNPs are useful in a wide variety of applications. Even though gold is biologically inert and thus shows much less toxicity, the relatively low rate of clearance from circulation and tissues can lead to health problems and therefore, specific targeting of diseased cells and tissues must be achieved before AuNPs find their application for routine human use.

  17. Chemical trimming overcoat: an enhancing composition and process for 193nm lithography

    NASA Astrophysics Data System (ADS)

    Liu, Cong; Rowell, Kevin; Joesten, Lori; Baranowski, Paul; Kaur, Irvinder; Huang, Wanyi; Leonard, JoAnne; Jeong, Hae-Mi; Im, Kwang-Hwyi; Estelle, Tom; Cutler, Charlotte; Pohlers, Gerd; Yin, Wenyan; Fallon, Patricia; Li, Mingqi; Jeon, Hyun; Xu, Cheng Bai; Trefonas, Pete

    2016-03-01

    As the critical dimension of devices is approaching the resolution limit of 193nm photo lithography, multiple patterning processes have been developed to print smaller CD and pitch. Multiple patterning and other advanced lithographic processes often require the formation of isolated features such as lines or posts by direct lithographic printing. The formation of isolated features with an acceptable process window, however, can pose a challenge as a result of poor aerial image contrast at defocus. Herein we report a novel Chemical Trimming Overcoat (CTO) as an extra step after lithography that allows us to achieve smaller feature size and better process window.

  18. Advances in targeted proteomics and applications to biomedical research

    PubMed Central

    Shi, Tujin; Song, Ehwang; Nie, Song; Rodland, Karin D.; Liu, Tao; Qian, Wei-Jun; Smith, Richard D.

    2016-01-01

    Targeted proteomics technique has emerged as a powerful protein quantification tool in systems biology, biomedical research, and increasing for clinical applications. The most widely used targeted proteomics approach, selected reaction monitoring (SRM), also known as multiple reaction monitoring (MRM), can be used for quantification of cellular signaling networks and preclinical verification of candidate protein biomarkers. As an extension to our previous review on advances in SRM sensitivity herein we review recent advances in the method and technology for further enhancing SRM sensitivity (from 2012 to present), and highlighting its broad biomedical applications in human bodily fluids, tissue and cell lines. Furthermore, we also review two recently introduced targeted proteomics approaches, parallel reaction monitoring (PRM) and data-independent acquisition (DIA) with targeted data extraction on fast scanning high-resolution accurate-mass (HR/AM) instruments. Such HR/AM targeted quantification with monitoring all target product ions addresses SRM limitations effectively in specificity and multiplexing; whereas when compared to SRM, PRM and DIA are still in the infancy with a limited number of applications. Thus, for HR/AM targeted quantification we focus our discussion on method development, data processing and analysis, and its advantages and limitations in targeted proteomics. Finally, general perspectives on the potential of achieving both high sensitivity and high sample throughput for large-scale quantification of hundreds of target proteins are discussed. PMID:27302376

  19. Thermal and Environmental Barrier Coatings for Advanced Turbine Engine Applications

    NASA Technical Reports Server (NTRS)

    Zhu, Dong-Ming; Miller, Robert A.

    2005-01-01

    Ceramic thermal and environmental barrier coatings (T/EBCs) will play a crucial role in advanced gas turbine engine systems because of their ability to significantly increase engine operating temperatures and reduce cooling requirements, thus help achieve engine low emission and high efficiency goals. Advanced T/EBCs are being developed for the low emission SiC/SiC ceramic matrix composite (CMC) combustor applications by extending the CMC liner and vane temperature capability to 1650 C (3000 F) in oxidizing and water vapor containing combustion environments. Low conductivity thermal barrier coatings (TBCs) are also being developed for metallic turbine airfoil and combustor applications, providing the component temperature capability up to 1650 C (3000 F). In this paper, ceramic coating development considerations and requirements for both the ceramic and metallic components will be described for engine high temperature and high-heat-flux applications. The underlying coating failure mechanisms and life prediction approaches will be discussed based on the simulated engine tests and fracture mechanics modeling results.

  20. Nanoscale Copper and Copper Compounds for Advanced Device Applications

    NASA Astrophysics Data System (ADS)

    Chen, Lih-Juann

    2016-12-01

    Copper has been in use for at least 10,000 years. Copper alloys, such as bronze and brass, have played important roles in advancing civilization in human history. Bronze artifacts date at least 6500 years. On the other hand, discovery of intriguing properties and new applications in contemporary technology for copper and its compounds, particularly on nanoscale, have continued. In this paper, examples for the applications of Cu and Cu alloys for advanced device applications will be given on Cu metallization in microelectronics devices, Cu nanobats as field emitters, Cu2S nanowire array as high-rate capability and high-capacity cathodes for lithium-ion batteries, Cu-Te nanostructures for field-effect transistor, Cu3Si nanowires as high-performance field emitters and efficient anti-reflective layers, single-crystal Cu(In,Ga)Se2 nanotip arrays for high-efficiency solar cell, multilevel Cu2S resistive memory, superlattice Cu2S-Ag2S heterojunction diodes, and facet-dependent Cu2O diode.

  1. Advances in targeted proteomics and applications to biomedical research

    SciTech Connect

    Shi, Tujin; Song, Ehwang; Nie, Song; Rodland, Karin D.; Liu, Tao; Qian, Wei-Jun; Smith, Richard D.

    2016-08-01

    Targeted proteomics technique has emerged as a powerful protein quantification tool in systems biology, biomedical research, and increasing for clinical applications. The most widely used targeted proteomics approach, selected reaction monitoring (SRM), also known as multiple reaction monitoring (MRM), can be used for quantification of cellular signaling networks and preclinical verification of candidate protein biomarkers. As an extension to our previous review on advances in SRM sensitivity (Shi et al., Proteomics, 12, 1074–1092, 2012) herein we review recent advances in the method and technology for further enhancing SRM sensitivity (from 2012 to present), and highlighting its broad biomedical applications in human bodily fluids, tissue and cell lines. Furthermore, we also review two recently introduced targeted proteomics approaches, parallel reaction monitoring (PRM) and data-independent acquisition (DIA) with targeted data extraction on fast scanning high-resolution accurate-mass (HR/AM) instruments. Such HR/AM targeted quantification with monitoring all target product ions addresses SRM limitations effectively in specificity and multiplexing; whereas when compared to SRM, PRM and DIA are still in the infancy with a limited number of applications. Thus, for HR/AM targeted quantification we focus our discussion on method development, data processing and analysis, and its advantages and limitations in targeted proteomics. Finally, general perspectives on the potential of achieving both high sensitivity and high sample throughput for large-scale quantification of hundreds of target proteins are discussed.

  2. Transcranial Doppler: Techniques and advanced applications: Part 2

    PubMed Central

    Sharma, Arvind K.; Bathala, Lokesh; Batra, Amit; Mehndiratta, Man Mohan; Sharma, Vijay K.

    2016-01-01

    Transcranial Doppler (TCD) is the only diagnostic tool that can provide continuous information about cerebral hemodynamics in real time and over extended periods. In the previous paper (Part 1), we have already presented the basic ultrasound physics pertaining to TCD, insonation methods, and various flow patterns. This article describes various advanced applications of TCD such as detection of right-to-left shunt, emboli monitoring, vasomotor reactivity (VMR), monitoring of vasospasm in subarachnoid hemorrhage (SAH), monitoring of intracranial pressure, its role in stoke prevention in sickle cell disease, and as a supplementary test for confirmation of brain death. PMID:27011639

  3. Application of scanning acoustic microscopy to advanced structural ceramics

    NASA Technical Reports Server (NTRS)

    Vary, Alex; Klima, Stanley J.

    1987-01-01

    A review is presentod of research investigations of several acoustic microscopy techniques for application to structural ceramics for advanced heat engines. Results obtained with scanning acoustic microscopy (SAM), scanning laser acoustic microscopy (SLAM), scanning electron acoustic microscopy (SEAM), and photoacoustic microscopy (PAM) are compared. The techniques were evaluated on research samples of green and sintered monolithic silicon nitrides and silicon carbides in the form of modulus-of-rupture bars containing deliberately introduced flaws. Strengths and limitations of the techniques are described with emphasis on statistics of detectability of flaws that constitute potential fracture origins.

  4. Application of advanced technology to future long-range aircraft

    NASA Technical Reports Server (NTRS)

    Schrader, O. E.

    1976-01-01

    An assessment is presented of three separate programs that have incorporated advanced technology into the design of long-range passenger and cargo aircraft. The first technology centers around the use of a span-loaded cargo aircraft with the payload distributed along the wing. The second technology is the application of laminar flow control to the aircraft to reduce the aerodynamic drag. The last program evaluates the production of alternate aircraft fuels from coal and the use of liquid hydrogen as an aircraft fuel.

  5. Application of advanced coating techniques to rocket engine components

    NASA Technical Reports Server (NTRS)

    Verma, S. K.

    1988-01-01

    The materials problem in the space shuttle main engine (SSME) is reviewed. Potential coatings and the method of their application for improved life of SSME components are discussed. A number of advanced coatings for turbine blade components and disks are being developed and tested in a multispecimen thermal fatigue fluidized bed facility at IIT Research Institute. This facility is capable of producing severe strains of the degree present in blades and disk components of the SSME. The potential coating systems and current efforts at IITRI being taken for life extension of the SSME components are summarized.

  6. Advancing Risk Assessment through the Application of Systems Toxicology

    PubMed Central

    Sauer, John Michael; Kleensang, André; Peitsch, Manuel C.; Hayes, A. Wallace

    2016-01-01

    Risk assessment is the process of quantifying the probability of a harmful effect to individuals or populations from human activities. Mechanistic approaches to risk assessment have been generally referred to as systems toxicology. Systems toxicology makes use of advanced analytical and computational tools to integrate classical toxicology and quantitative analysis of large networks of molecular and functional changes occurring across multiple levels of biological organization. Three presentations including two case studies involving both in vitro and in vivo approaches described the current state of systems toxicology and the potential for its future application in chemical risk assessment. PMID:26977253

  7. Advanced stress analysis methods applicable to turbine engine structures

    NASA Technical Reports Server (NTRS)

    Pian, Theodore H. H.

    1991-01-01

    The following tasks on the study of advanced stress analysis methods applicable to turbine engine structures are described: (1) constructions of special elements which contain traction-free circular boundaries; (2) formulation of new version of mixed variational principles and new version of hybrid stress elements; (3) establishment of methods for suppression of kinematic deformation modes; (4) construction of semiLoof plate and shell elements by assumed stress hybrid method; and (5) elastic-plastic analysis by viscoplasticity theory using the mechanical subelement model.

  8. Characteristics and applications of advanced technology microchannel plates

    NASA Astrophysics Data System (ADS)

    Horton, Jerry R.; Tasker, G. William; Fijol, John J.

    1990-10-01

    A method for fabrication of novel thin-filrn continuous dynode electron multipliers is described. We have shown the feasibility of crucial manufacturing steps, including anisotropic dry etching of substrates into photolithographically-defined arrays of high-aspect-ratio channels, and the formation of thin-film continuous dynodes by chemical vapor deposition. We discuss potential performance and design advantages of this advanced technology microchannel plate (AT-MCP) over the conven tional reduced lead silicate glass inicrochannel plate (RLSG-'MCP) and implications for new applications.

  9. Recent advances to NEC (Numerical Electromagnetics Code): Applications and validation

    SciTech Connect

    Burke, G.J. )

    1989-03-03

    Capabilities of the antenna modeling code NEC are reviewed and results are presented to illustrate typical applications. Recent developments are discussed that will improve accuracy in modeling electrically small antennas, stepped-radius wires and junctions of tightly coupled wires, and also a new capability for modeling insulated wires in air or earth is described. These advances will be included in a future release of NEC, while for now the results serve to illustrate limitations of the present code. NEC results are compared with independent analytical and numerical solutions and measurements to validate the model for wires near ground and for insulated wires. 41 refs., 26 figs., 1 tab.

  10. Applications of advanced transport aircraft in developing countries

    NASA Technical Reports Server (NTRS)

    Gobetz, F. W.; Assarabowski, R. J.; Leshane, A. A.

    1978-01-01

    Four representative market scenarios were studied to evaluate the relative performance of air-and surface-based transportation systems in meeting the needs of two developing contries, Brazil and Indonesia, which were selected for detailed case studies. The market scenarios were: remote mining, low-density transport, tropical forestry, and large cargo aircraft serving processing centers in resource-rich, remote areas. The long-term potential of various aircraft types, together with fleet requirements and necessary technology advances, is determined for each application.

  11. Advances and applications of induced pluripotent stem cells.

    PubMed

    Pietronave, Stefano; Prat, Maria

    2012-03-01

    Direct reprogramming of somatic cells into pluripotent cells is an emerging technology for creating patient-specific cells, and potentially opens new scenarios in medical and pharmacological fields. From the discovery of Shinya Yamanaka, who first obtained pluripotent cells from fibroblasts by retrovirus-derived ectopic expression of defined embryonic transcription factors, new methods have been developed to generate safe induced pluripotent stem (iPS) cells without genomic manipulations. This review will focus on the recent advances in iPS technology and their application in pharmacology and medicine.

  12. Double exposure technology for KrF lithography

    NASA Astrophysics Data System (ADS)

    Geisler, S.; Bauer, J.; Haak, U.; Stolarek, D.; Schulz, K.; Wolf, H.; Meier, W.; Trojahn, M.; Matthus, E.; Beyer, H.; Old, G.; Marschmeyer, St.; Kuck, B.

    2008-04-01

    The application of Double Exposure Lithography (DEL) would enlarge the capability of 248 nm exposure technique to smaller pitch. We will use the DEL for the integration of critical layers for dedicated applications requiring resolution enhancement into 0.13 μm BiCMOS technology. In this paper we present the overlay precision and the focus difference of 1st and 2nd exposure as critical parameters of the DEL for k I <= 0.3 lithography (100 nm half pitch) with binary masks (BIM). The realization of excellent overlay (OVL) accuracy is a main key of double exposure and double patterning techniques. We show the DEL requires primarily a good mask registration, when the wafer stays in the scanner for both exposures without alignment between 1st and 2nd exposure. The exposure tool overlay error is more a practical limit for double patterning lithography (DPL). Hence we prefer the DEL for the resolution enhancement, especially if we use the KrF high NA lithography tool for 130 nm generation. Experimental and simulated results show that the critical dimension uniformity (CDU) depends strongly on the overlay precision. The DEL results show CDU is not only affected by the OVL but also by an optical proximity effect of 1st and 2nd exposure and the mask registration. The CD uniformity of DEL demands a low focus difference between 1st and 2nd exposure and therefore requires a good focus repeatability of the exposure tool. The Depth of Focus (DOF) of 490 nm at stable CD of lines was achieved for DEL. If we change the focus of one of the exposures the CD-focus performance of spaces was reduced with simultaneous line position changing. CDU vs. focus difference between 1st and 2nd exposure demands a focus repeatability <100 nm for the exposure tool. Summary, the results show DEL has the potential to be a practical lithography enhancement method for device fabrication using high NA KrF tool generation.

  13. Prevention of optics and resist contamination in 300-mm lithography: improvements in chemical air filtration

    NASA Astrophysics Data System (ADS)

    Kinkead, Devon A.; Grayfer, Anatoly; Kishkovich, Oleg P.

    2001-08-01

    Atmospheric pressure deep UV lithography using fast chemically amplified photoresists will be the mainstay of semiconductor production into the foreseeable future. Airborne molecular contamination (AMC) in the form of bases and condensable organic and inorganic materials however, threaten both sensitive optics and modern resists thereby creating a host of yield limiting contamination issues. Past work by Kunz at MIT has described photo-induced organic contamination of lithographic optics as a significant concern in leading-edge lithography. Moreover, Kinkead and Ercken, and Kishkovich and Dean have published work on the impact of base contamination on CD uniformity in modern photoresists. Herein, the authors discuss solutions to control both optics and resist contamination in a single compact filter system for advanced lithography. The results of this work suggest that resist and optics contamination can be controlled as we enter the era of low K1 factor <150nm/300mm-device production.

  14. Demonstration of EDA flow for massively parallel e-beam lithography

    NASA Astrophysics Data System (ADS)

    Brandt, P.; Belledent, J.; Tranquillin, C.; Figueiro, T.; Meunier, S.; Bayle, S.; Fay, A.; Milléquant, M.; Icard, B.; Wieland, M.

    2014-03-01

    Today's soaring complexity in pushing the limits of 193nm immersion lithography drives the development of other technologies. One of these alternatives is mask-less massively parallel electron beam lithography, (MP-EBL), a promising candidate in which future resolution needs can be fulfilled at competitive cost. MAPPER Lithography's MATRIX MP-EBL platform has currently entered an advanced stage of development. The first tool in this platform, the FLX 1200, will operate using more than 1,300 beams, each one writing a stripe 2.2μm wide. 0.2μm overlap from stripe to stripe is allocated for stitching. Each beam is composed of 49 individual sub-beams that can be blanked independently in order to write in a raster scan pixels onto the wafer.

  15. Nanoimprint lithography for green water-repellent film derived from biomass with high-light transparency

    NASA Astrophysics Data System (ADS)

    Takei, Satoshi; Hanabata, Makoto

    2015-03-01

    Newly eco-friendly high light transparency film with plant-based materials was investigated to future development of liquid crystal displays and optical devices with water repellency as a chemical design concept of nanoimprint lithography. This procedure is proven to be suitable for material design and the process conditions of ultraviolet curing nanoimprint lithography for green water-repellent film derived from biomass with high-light transparency. The developed formulation of advanced nanoimprinted materials design derived from lactulose and psicose, and the development of suitable UV nanoimprint conditions produced high resolutions of the conical shaped moth-eye regularly-nanostructure less than approximately 200 nm diameter, and acceptable patterning dimensional accuracy by the replication of 100 times of UV nanoimprint lithography cycles. The newly plant-based materials and the process conditions are expected as one of the defect less nanoimprint lithographic technologies in next generation electronic devices.

  16. Advanced Developments in Cyclic Polymers: Synthesis, Applications, and Perspectives

    PubMed Central

    Zhu, Yinghuai; Hosmane, Narayan S

    2015-01-01

    Due to the topological effect, cyclic polymers demonstrate different and unique physical and biological properties in comparison with linear counterparts having the same molecular-weight range. With advanced synthetic and analytic technologies, cyclic polymers with different topologies, e.g. multicyclic polymers, have been reported and well characterized. For example, various cyclic DNA and related structures, such as cyclic duplexes, have been prepared conveniently by click chemistry. These types of DNA have increased resistance to enzymatic degradation and have high thermodynamic stability, and thus, have potential therapeutic applications. In addition, cyclic polymers have also been used to prepare organic–inorganic hybrids for applications in catalysis, e.g. catalyst supports. Due to developments in synthetic technology, highly pure cyclic polymers could now be produced in large scale. Therefore, we anticipate discovering more applications in the near future. Despite their promise, cyclic polymers are still less explored than linear polymers like polyolefins and polycarbonates, which are widely used in daily life. Some critical issues, including controlling the molecular weight and finding suitable applications, remain big challenges in the cyclic-polymer field. This review briefly summarizes the commonly used synthetic methodologies and focuses more on the attractive functional materials and their biological properties and potential applications. PMID:26478835

  17. Advances in polymeric systems for tissue engineering and biomedical applications.

    PubMed

    Ravichandran, Rajeswari; Sundarrajan, Subramanian; Venugopal, Jayarama Reddy; Mukherjee, Shayanti; Ramakrishna, Seeram

    2012-03-01

    The characteristics of tissue engineered scaffolds are major concerns in the quest to fabricate ideal scaffolds for tissue engineering applications. The polymer scaffolds employed for tissue engineering applications should possess multifunctional properties such as biocompatibility, biodegradability and favorable mechanical properties as it comes in direct contact with the body fluids in vivo. Additionally, the polymer system should also possess biomimetic architecture and should support stem cell adhesion, proliferation and differentiation. As the progress in polymer technology continues, polymeric biomaterials have taken characteristics more closely related to that desired for tissue engineering and clinical needs. Stimuli responsive polymers also termed as smart biomaterials respond to stimuli such as pH, temperature, enzyme, antigen, glucose and electrical stimuli that are inherently present in living systems. This review highlights the exciting advancements in these polymeric systems that relate to biological and tissue engineering applications. Additionally, several aspects of technology namely scaffold fabrication methods and surface modifications to confer biological functionality to the polymers have also been discussed. The ultimate objective is to emphasize on these underutilized adaptive behaviors of the polymers so that novel applications and new generations of smart polymeric materials can be realized for biomedical and tissue engineering applications.

  18. Recent Advances in Application of Biosensors in Tissue Engineering

    PubMed Central

    Paul, Arghya; Lee, Yong-kyu; Jaffa, Ayad A.

    2014-01-01

    Biosensors research is a fast growing field in which tens of thousands of papers have been published over the years, and the industry is now worth billions of dollars. The biosensor products have found their applications in numerous industries including food and beverages, agricultural, environmental, medical diagnostics, and pharmaceutical industries and many more. Even though numerous biosensors have been developed for detection of proteins, peptides, enzymes, and numerous other biomolecules for diverse applications, their applications in tissue engineering have remained limited. In recent years, there has been a growing interest in application of novel biosensors in cell culture and tissue engineering, for example, real-time detection of small molecules such as glucose, lactose, and H2O2 as well as serum proteins of large molecular size, such as albumin and alpha-fetoprotein, and inflammatory cytokines, such as IFN-g and TNF-α. In this review, we provide an overview of the recent advancements in biosensors for tissue engineering applications. PMID:25165697

  19. Fabrication of subwavelength holes using nanoimprint lithography

    NASA Astrophysics Data System (ADS)

    Weiss, A.; Besser, J.; Baum, M.; Saupe, R.; Otto, T.; Gessner, T.

    2013-03-01

    Driven by the demand of miniaturized and highly integrated functionalities in the area of photonics and photonic circuits, the metal or plasmon optics has become a promising method for manipulating light at the nanometer scale. Especially the application of periodic sub wavelength hole structures within an opaque metal film on a dielectric substrate holds many advantages for the realization of optical filters, since the variation of the hole diameter and the periodicity allows a selective filter response. This paper is concerned with the modeling, fabrication and characterization of a sub wavelength hole array for surface plasmon enhanced transmission of light [1]. The theoretical backgrounds as well as the basics of the simulation by Finite-Difference Time-Domain (FDTD) are described for the target structure with a hole diameter of 180 nm and a periodicity of 400 nm. By using a double-molding technology via nanoimprint lithography the fabrication of this sub wavelength hole array with a peak wavelength of 470 nm and full width at half maximum of 50 nm from a silicon nanopillar master is demonstrated. In order to ensure the dimensional stability of the molded structures, characterization was consequently done by means of a self made non-contact mode atomic force microscope.

  20. Maskless plasmonic lithography at 22 nm resolution.

    PubMed

    Pan, Liang; Park, Yongshik; Xiong, Yi; Ulin-Avila, Erick; Wang, Yuan; Zeng, Li; Xiong, Shaomin; Rho, Junsuk; Sun, Cheng; Bogy, David B; Zhang, Xiang

    2011-01-01

    Optical imaging and photolithography promise broad applications in nano-electronics, metrologies, and single-molecule biology. Light diffraction however sets a fundamental limit on optical resolution, and it poses a critical challenge to the down-scaling of nano-scale manufacturing. Surface plasmons have been used to circumvent the diffraction limit as they have shorter wavelengths. However, this approach has a trade-off between resolution and energy efficiency that arises from the substantial momentum mismatch. Here we report a novel multi-stage scheme that is capable of efficiently compressing the optical energy at deep sub-wavelength scales through the progressive coupling of propagating surface plasmons (PSPs) and localized surface plasmons (LSPs). Combining this with airbearing surface technology, we demonstrate a plasmonic lithography with 22 nm half-pitch resolution at scanning speeds up to 10 m/s. This low-cost scheme has the potential of higher throughput than current photolithography, and it opens a new approach towards the next generation semiconductor manufacturing.

  1. Resist profile simulation with fast lithography model

    NASA Astrophysics Data System (ADS)

    He, Yan-Ying; Chou, Chih-Shiang; Tang, Yu-Po; Huang, Wen-Chun; Liu, Ru-Gun; Gau, Tsai-Sheng

    2014-03-01

    A traditional approach to construct a fast lithographic model is to match wafer top-down SEM images, contours and/or gauge CDs with a TCC model plus some simple resist representation. This modeling method has been proven and is extensively used for OPC modeling. As the technology moves forward, this traditional approach has become insufficient in regard to lithography weak point detection, etching bias prediction, etc. The drawback of this approach is from metrology and simulation. First, top-down SEM is only good for acquiring planar CD information. Some 3D metrology such as cross-section SEM or AFM is necessary to obtain the true resist profile. Second, the TCC modeling approach is only suitable for planar image simulation. In order to model the resist profile, full 3D image simulation is needed. Even though there are many rigorous simulators capable of catching the resist profile very well, none of them is feasible for full-chip application due to the tremendous consumption of computational resource. The authors have proposed a quasi-3D image simulation method in the previous study [1], which is suitable for full-chip simulation with the consideration of sidewall angles, to improve the model accuracy of planar models. In this paper, the quasi-3D image simulation is extended to directly model the resist profile with AFM and/or cross-section SEM data. Resist weak points detected by the model generated with this 3D approach are verified on the wafer.

  2. Application of NASA's advanced life support technologies in polar regions

    NASA Astrophysics Data System (ADS)

    Bubenheim, D. L.; Lewis, C.

    1997-01-01

    NASA's advanced life support technologies are being combined with Arctic science and engineering knowledge in the Advanced Life Systems for Extreme Environments (ALSEE) project. This project addresses treatment and reduction of waste, purification and recycling of water, and production of food in remote communities of Alaska. The project focus is a major issue in the state of Alaska and other areas of the Circumpolar North; the health and welfare of people, their lives and the subsistence lifestyle in remote communities, care for the environment, and economic opportunity through technology transfer. The challenge is to implement the technologies in a manner compatible with the social and economic structures of native communities, the state, and the commercial sector. NASA goals are technology selection, system design and methods development of regenerative life support systems for planetary and Lunar bases and other space exploration missions. The ALSEE project will provide similar advanced technologies to address the multiple problems facing the remote communities of Alaska and provide an extreme environment testbed for future space applications. These technologies have never been assembled for this purpose. They offer an integrated approach to solving pressing problems in remote communities.

  3. Recent advances in industrial application of tannases: a review.

    PubMed

    Beniwal, Vikas; Kumar, Anil; Sharma, Jitender; Chhokar, Vinod

    2013-12-01

    Tannin acyl hydrolase (E.C. 3.1.1.20) commonly referred as tannase, is a hydrolytic enzyme that catalyses the hydrolysis of ester bonds present in gallotannins, ellagitannins, complex tannins and gallic acid esters. Tannases are the important group of botechnologically relevant enzymes distributed throughout the animal, plant and microbial kingdoms. However, microbial tannases are currently receiving a great deal of attention. Tannases are extensively used in food, feed, pharmaceutical, beverage, brewing and chemical industries. Owing to its diverse area of applications, a number of patents have been appeared in the recent past. The present review pretends to present the advances and perspectives in the industrial application of tannase with special emphasis on patents.

  4. Advanced Electric Submersible Pump Design Tool for Geothermal Applications

    SciTech Connect

    Xuele Qi; Norman Turnquist; Farshad Ghasripoor

    2012-05-31

    Electrical Submersible Pumps (ESPs) present higher efficiency, larger production rate, and can be operated in deeper wells than the other geothermal artificial lifting systems. Enhanced Geothermal Systems (EGS) applications recommend lifting 300 C geothermal water at 80kg/s flow rate in a maximum 10-5/8-inch diameter wellbore to improve the cost-effectiveness. In this paper, an advanced ESP design tool comprising a 1D theoretical model and a 3D CFD analysis has been developed to design ESPs for geothermal applications. Design of Experiments was also performed to optimize the geometry and performance. The designed mixed-flow type centrifugal impeller and diffuser exhibit high efficiency and head rise under simulated EGS conditions. The design tool has been validated by comparing the prediction to experimental data of an existing ESP product.

  5. Gold nanoparticles in biomedical applications: recent advances and perspectives.

    PubMed

    Dykman, Lev; Khlebtsov, Nikolai

    2012-03-21

    Gold nanoparticles (GNPs) with controlled geometrical, optical, and surface chemical properties are the subject of intensive studies and applications in biology and medicine. To date, the ever increasing diversity of published examples has included genomics and biosensorics, immunoassays and clinical chemistry, photothermolysis of cancer cells and tumors, targeted delivery of drugs and antigens, and optical bioimaging of cells and tissues with state-of-the-art nanophotonic detection systems. This critical review is focused on the application of GNP conjugates to biomedical diagnostics and analytics, photothermal and photodynamic therapies, and delivery of target molecules. Distinct from other published reviews, we present a summary of the immunological properties of GNPs. For each of the above topics, the basic principles, recent advances, and current challenges are discussed (508 references).

  6. Advanced Embedded Active Assemblies for Extreme Space Applications

    NASA Technical Reports Server (NTRS)

    DelCastillo, Linda; Moussessian, Alina; Mojarradi, Mohammad; Kolawa, Elizabeth

    2009-01-01

    This work describes the development and evaluation of advanced technologies for the integration of electronic die within membrane polymers. Specifically, investigators thinned silicon die, electrically connecting them with circuits on flexible liquid crystal polymer (LCP), using gold thermo-compression flip chip bonding, and embedding them within the material. Daisy chain LCP assemblies were thermal cycled from -135 to +85degC (Mars surface conditions for motor control electronics). The LCP assembly method was further utilized to embed an operational amplifier designed for operation within the Mars surface ambient. The embedded op-amp assembly was evaluated with respect to the influence of temperature on the operational characteristics of the device. Applications for this technology range from multifunctional, large area, flexible membrane structures to small-scale, flexible circuits that can be fit into tight spaces for flex to fit applications.

  7. Advancing pig cloning technologies towards application in regenerative medicine.

    PubMed

    Nagashima, H; Matsunari, H; Nakano, K; Watanabe, M; Umeyama, K; Nagaya, M

    2012-08-01

    Regenerative medicine is expected to make a significant contribution by development of novel therapeutic treatments for intractable diseases and for improving the quality of life of patients. Many advances in regenerative medicine, including basic and translational research, have been developed and tested in experimental animals; pigs have played an important role in various aspects of this work. The value of pigs as a model species is being enhanced by the generation of specially designed animals through cloning and genetic modifications, enabling more sophisticated research to be performed and thus accelerating the clinical application of regenerative medicine. This article reviews the significant aspects of the creation and application of cloned and genetically modified pigs in regenerative medicine research and considers the possible future directions of the technology. We also discuss the importance of reproductive biology as an interface between basic science and clinical medicine.

  8. Recent advances in phosphate laser glasses for high power applications

    SciTech Connect

    Campbell, J.H.

    1996-05-14

    Recent advances in Nd-doped phosphate laser glasses for high-peak-power and high-average-power applications are reviewed. Compositional studies have progressed to the point that glasses can be tailored to have specific properties for specific applications. Non-radiative relaxation effects can be accurately modeled and empirical expressions have been developed to evaluate both intrinsic (structural) and extrinsic (contamination induced) relaxation effects. Losses due to surface scattering and bulk glass absorption have been carefully measured and can be accurately predicted. Improvements in processing have lead to high damage threshold (e.g. Pt inclusion free) and high thermal shock resistant glasses with improved edge claddings. High optical quality pieces up to 79 x 45 x 4cm{sup 3} have been made and methods for continuous melting laser glass are under development.

  9. A Low-Cost Hands-On Laboratory to Introduce Lithography Concepts

    ERIC Educational Resources Information Center

    Jalali, M.; Marti, J. J.; Kirchhoff, A. L.; Lawrenz, F.; Campbell, S. A.

    2012-01-01

    A lithography lab course has been developed that is applicable to students from the middle-school level up to college students. It can also be inserted into electronics technology or similar courses in two- and four-year colleges, or used to demonstrate applications of polymers in chemistry classes. Some of these techniques would enable research…

  10. Extreme-UV lithography condenser

    DOEpatents

    Sweatt, William C.; Sweeney, Donald W.; Shafer, David; McGuire, James

    2001-01-01

    Condenser system for use with a ringfield camera in projection lithography where the condenser includes a series of segments of a parent aspheric mirror having one foci at a quasi-point source of radiation and the other foci at the radius of a ringfield have all but one or all of their beams translated and rotated by sets of mirrors such that all of the beams pass through the real entrance pupil of a ringfield camera about one of the beams and fall onto the ringfield radius as a coincident image as an arc of the ringfield. The condenser has a set of correcting mirrors with one of the correcting mirrors of each set, or a mirror that is common to said sets of mirrors, from which the radiation emanates, is a concave mirror that is positioned to shape a beam segment having a chord angle of about 25 to 85 degrees into a second beam segment having a chord angle of about 0 to 60 degrees.

  11. Array imaging system for lithography

    NASA Astrophysics Data System (ADS)

    Kirner, Raoul; Mueller, Kevin; Malaurie, Pauline; Vogler, Uwe; Noell, Wilfried; Scharf, Toralf; Voelkel, Reinhard

    2016-09-01

    We present an integrated array imaging system based on a stack of microlens arrays. The microlens arrays are manufactured by melting resist and reactive ion etching (RIE) technology on 8'' wafers (fused silica) and mounted by wafer-level packaging (WLP)1. The array imaging system is configured for 1X projection (magnification m = +1) of a mask pattern onto a planar wafer. The optical system is based on two symmetric telescopes, thus anti-symmetric wavefront aberrations like coma, distortion, lateral color are minimal. Spherical aberrations are reduced by using microlenses with aspherical lens profiles. In our system design approach, sub-images of individual imaging channels do not overlap to avoid interference. Image superposition is achieved by moving the array imaging system during the exposure time. A tandem Koehler integrator illumination system (MO Exposure Optics) is used for illumination. The angular spectrum of the illumination light underfills the pupils of the imaging channels to avoid crosstalk. We present and discuss results from simulation, mounting and testing of a first prototype of the investigated array imaging system for lithography.

  12. Intelligent Facial Recognition Systems: Technology advancements for security applications

    SciTech Connect

    Beer, C.L.

    1993-07-01

    Insider problems such as theft and sabotage can occur within the security and surveillance realm of operations when unauthorized people obtain access to sensitive areas. A possible solution to these problems is a means to identify individuals (not just credentials or badges) in a given sensitive area and provide full time personnel accountability. One approach desirable at Department of Energy facilities for access control and/or personnel identification is an Intelligent Facial Recognition System (IFRS) that is non-invasive to personnel. Automatic facial recognition does not require the active participation of the enrolled subjects, unlike most other biological measurement (biometric) systems (e.g., fingerprint, hand geometry, or eye retinal scan systems). It is this feature that makes an IFRS attractive for applications other than access control such as emergency evacuation verification, screening, and personnel tracking. This paper discusses current technology that shows promising results for DOE and other security applications. A survey of research and development in facial recognition identified several companies and universities that were interested and/or involved in the area. A few advanced prototype systems were also identified. Sandia National Laboratories is currently evaluating facial recognition systems that are in the advanced prototype stage. The initial application for the evaluation is access control in a controlled environment with a constant background and with cooperative subjects. Further evaluations will be conducted in a less controlled environment, which may include a cluttered background and subjects that are not looking towards the camera. The outcome of the evaluations will help identify areas of facial recognition systems that need further development and will help to determine the effectiveness of the current systems for security applications.

  13. An advanced Gibbs-Duhem integration method: theory and applications.

    PubMed

    van 't Hof, A; Peters, C J; de Leeuw, S W

    2006-02-07

    The conventional Gibbs-Duhem integration method is very convenient for the prediction of phase equilibria of both pure components and mixtures. However, it turns out to be inefficient. The method requires a number of lengthy simulations to predict the state conditions at which phase coexistence occurs. This number is not known from the outset of the numerical integration process. Furthermore, the molecular configurations generated during the simulations are merely used to predict the coexistence condition and not the liquid- and vapor-phase densities and mole fractions at coexistence. In this publication, an advanced Gibbs-Duhem integration method is presented that overcomes above-mentioned disadvantage and inefficiency. The advanced method is a combination of Gibbs-Duhem integration and multiple-histogram reweighting. Application of multiple-histogram reweighting enables the substitution of the unknown number of simulations by a fixed and predetermined number. The advanced method has a retroactive nature; a current simulation improves the predictions of previously computed coexistence points as well. The advanced Gibbs-Duhem integration method has been applied for the prediction of vapor-liquid equilibria of a number of binary mixtures. The method turned out to be very convenient, much faster than the conventional method, and provided smooth simulation results. As the employed force fields perfectly predict pure-component vapor-liquid equilibria, the binary simulations were very well suitable for testing the performance of different sets of combining rules. Employing Lorentz-Hudson-McCoubrey combining rules for interactions between unlike molecules, as opposed to Lorentz-Berthelot combining rules for all interactions, considerably improved the agreement between experimental and simulated data.

  14. 12 CFR 950.2 - Authorization and application for advances; obligation to repay advances.

    Code of Federal Regulations, 2011 CFR

    2011-01-01

    ... HOME LOAN BANK ASSETS AND OFF-BALANCE SHEET ITEMS ADVANCES Advances to Out-of-District Members and... transaction, for money borrowed from a Bank by a member of any Bank shall be considered an advance subject...

  15. Fabrication of 3D polymer microstructures using electron beam lithography and nanoimprinting technologies

    NASA Astrophysics Data System (ADS)

    Chen, Kuo-Shen; Lin, I.-Kuan; Ko, Fu-Hsang

    2005-10-01

    Recently, with the advancement in bio-MEMS and micro optoelectromechanical systems (MOEMS), 3D microstructures have become increasingly important and efficient fabrication processes are currently being sought. In this paper, a novel 3D fabrication process has been proposed by utilizing the proximity effect of electron beam lithography (EBL) to create 3D microstructures on negative photoresists as the primary molds, which are subsequently transferred to their corresponding negative molds using nanoimprinting lithography (NIL), and to form the final replicas by either electroforming or polymer spin casting to reduce cost. The effect of electron backscattering on the 3D topography is firstly investigated and the relationship among the spatial distribution of electron beam irradiation, the spot size and the dosage level of irradiation is experimentally characterized in SU-8 to establish a dosage kernel distribution function. A mathematical procedure based on linear operation of this kernel function is then proposed to mimic the EBL fabrication process. The subsequent experiments indicate that the predicted surface profiles agree with the experimental results to large extent and the proposed mathematical operations are valid for the purpose of designing the fabrication process. Finally, the SU-8 primary molds are transferred to NEB to form secondary molds via the nanoimprinting process. It shows that the nanoimprinting process can essentially reproduce the shape and geometry of the primary molds. However, due to the nature of polymer-to-polymer contact printing, the elastic restitution of materials induces a slight deviation of the final device size and a further study should be made in the future to minimize such types of error. Although the above problems are reported, nevertheless, the primary experimental results indicate that this proposed fabrication process is capable of creating 3D shape microstructure in the order of 1 µm and should be useful for related

  16. Advanced Ceramic Matrix Composites (CMCs) for High Temperature Applications

    NASA Technical Reports Server (NTRS)

    Singh, M.

    2005-01-01

    Advanced ceramic matrix composites (CMCs) are enabling materials for a number of demanding applications in aerospace, energy, and nuclear industries. In the aerospace systems, these materials are being considered for applications in hot sections of jet engines such as the combustor liner, vanes, nozzle components, nose cones, leading edges of reentry vehicles, and space propulsion components. Applications in the energy and environmental industries include radiant heater tubes, heat exchangers, heat recuperators, gas and diesel particulate filters, and components for land based turbines for power generation. These materials are also being considered for use in the first wall and blanket components of fusion reactors. In the last few years, a number of CMC components have been developed and successfully tested for various aerospace and ground based applications. However, a number of challenges still remain slowing the wide scale implementation of these materials. They include robust fabrication and manufacturing, assembly and integration, coatings, property modeling and life prediction, design codes and databases, repair and refurbishment, and cost. Fabrication of net and complex shape components with high density and tailorable matrix properties is quite expensive, and even then various desirable properties are not achievable. In this presentation, a number of examples of successful CMC component development and testing will be provided. In addition, critical need for robust manufacturing, joining and assembly technologies in successful implementation of these systems will be discussed.

  17. Advances and applications of molecular cloning in clinical microbiology.

    PubMed

    Sharma, Kamal; Mishra, Ajay Kumar; Mehraj, Vikram; Duraisamy, Ganesh Selvaraj

    2014-10-01

    Molecular cloning is based on isolation of a DNA sequence of interest to obtain multiple copies of it in vitro. Application of this technique has become an increasingly important tool in clinical microbiology due to its simplicity, cost effectiveness, rapidity, and reliability. This review entails the recent advances in molecular cloning and its application in the clinical microbiology in the context of polymicrobial infections, recombinant antigens, recombinant vaccines, diagnostic probes, antimicrobial peptides, and recombinant cytokines. Culture-based methods in polymicrobial infection have many limitation, which has been overcome by cloning techniques and provide gold standard technique. Recombinant antigens produced by cloning technique are now being used for screening of HIV, HCV, HBV, CMV, Treponema pallidum, and other clinical infectious agents. Recombinant vaccines for hepatitis B, cholera, influenza A, and other diseases also use recombinant antigens which have replaced the use of live vaccines and thus reduce the risk for adverse effects. Gene probes developed by gene cloning have many applications including in early diagnosis of hereditary diseases, forensic investigations, and routine diagnosis. Industrial application of this technology produces new antibiotics in the form of antimicrobial peptides and recombinant cytokines that can be used as therapeutic agents.

  18. Lithography aware overlay metrology target design method

    NASA Astrophysics Data System (ADS)

    Lee, Myungjun; Smith, Mark D.; Lee, Joonseuk; Jung, Mirim; Lee, Honggoo; Kim, Youngsik; Han, Sangjun; Adel, Michael E.; Lee, Kangsan; Lee, Dohwa; Choi, Dongsub; Liu, Zephyr; Itzkovich, Tal; Levinski, Vladimir; Levy, Ady

    2016-03-01

    We present a metrology target design (MTD) framework based on co-optimizing lithography and metrology performance. The overlay metrology performance is strongly related to the target design and optimizing the target under different process variations in a high NA optical lithography tool and measurement conditions in a metrology tool becomes critical for sub-20nm nodes. The lithography performance can be quantified by device matching and printability metrics, while accuracy and precision metrics are used to quantify the metrology performance. Based on using these metrics, we demonstrate how the optimized target can improve target printability while maintaining the good metrology performance for rotated dipole illumination used for printing a sub-100nm diagonal feature in a memory active layer. The remaining challenges and the existing tradeoff between metrology and lithography performance are explored with the metrology target designer's perspective. The proposed target design framework is completely general and can be used to optimize targets for different lithography conditions. The results from our analysis are both physically sensible and in good agreement with experimental results.

  19. High-n immersion lithography

    NASA Astrophysics Data System (ADS)

    Sewell, Harry; Mulkens, Jan; Graeupner, Paul; McCafferty, Diane; Markoya, Louis; Donders, Sjoerd; Cortie, Rogier; Meijers, Ralph; Evangelista, Fabrizio; Samarakone, Nandarisi

    2008-03-01

    A two-year study on the feasibility of High-n Immersion Lithography shows very promising results. This paper reports the findings of the study. The evaluation shows the tremendous progress made in the development of second-generation immersion fluid technology. Candidate fluids from several suppliers have been evaluated. All the commercial fluids evaluated are viable, so there are a number of options. Life tests have been conducted on bench top fluid-handling systems and the results referenced to full-scale systems. Parameters such as Dose per Laser Pulse, Pulse Rate, Fluid Flow Rate, and Fluid Absorbency at 193nm, and Oxygen/Air Contamination Levels were explored. A detailed evaluation of phenomena such as Last Lens Element (LLE) contamination has been conducted. Lens cleaning has been evaluated. A comparison of High-n fluid-based technology and water-based immersion technology shows interesting advantages of High-n fluid in the areas of Defect and Resist Interaction. Droplet Drying tests, Resist Staining evaluations, and Resist Contrast impact studies have all been run. Defect-generating mechanisms have been identified and are being eliminated. The lower evaporation rate of the High-n fluids compared with water shows the advantages of High-n Immersion. The core issue for the technology, the availability of High-n optical material for use as the final lens element, is updated. Samples of LuAG material have been received from development partners and have been evaluated. The latest status of optical materials and the technology timelines are reported. The potential impact of the availability of the technology is discussed. Synergy with technologies such as Double Patterning is discussed. The prospects for <22nm (hp) are evaluated.

  20. Microfluidic structures for LOC devices designed by laser lithography

    NASA Astrophysics Data System (ADS)

    Figurova, M.; Pudis, D.; Gaso, P.

    2016-12-01

    Nowadays, lab on a chip (LOC) applications are very popular in the field of biomedicine. LOC device works with biological materials and enables to arrange conventional laboratory operations on a small chip. Philosophy of LOC applications stands on quick and precise diagnostics process and technology, which uses cheap materials with possibility of rapid prototyping. LOC, as a time saving application, works with small volume of samples and reagents and enables better control over the sample. We present fabrication method of functional LOC chip for different biomedical microfluidic applications based on direct laser writing (DLW) lithography. We present fabrication of few types of microfluidic and micro-optic structures with different capabilities created by DLW system. The combination of DLW lithography in photoresist layer deposited on glass substrate and polydimethylsiloxane (PDMS) replica molding process were used for patterning of designed microstructures. Prepared microfluidic and micro-optic structures were observed by confocal microscope and microfluidic flow observations were investigated by conventional optical microscope and CCD camera.

  1. Self-cleaning optic for extreme ultraviolet lithography

    DOEpatents

    Klebanoff, Leonard E.; Stulen, Richard H.

    2003-12-16

    A multilayer reflective optic or mirror for lithographic applications, and particularly extreme ultraviolet (EUV) lithography, having a surface or "capping" layer which in combination with incident radiation and gaseous molecular species such as O.sub.2, H.sub.2, H.sub.2 O provides for continuous cleaning of carbon deposits from the optic surface. The metal capping layer is required to be oxidation resistant and capable of transmitting at least 90% of incident EUV radiation. Materials for the capping layer include Ru, Rh, Pd, Ir, Pt and Au and combinations thereof.

  2. Flexible Transition Metal Oxide Electronics and Imprint Lithography

    NASA Astrophysics Data System (ADS)

    Jackson, Warren B.

    The previous chapters have discussed inorganic low-deposition temperature materials suitable for flexible applications, such as amorphous and nano-crystalline-silicon (Si) and organic conductors. This chapter presents the results of a recently developed inorganic low-temperature materials system, transition metal oxides (TMOs), that appears to be a very promising, new high-performance flexible electronic materials system. An equally, if not more, important part of this chapter, is the presentation of self-aligned imprint lithography (SAIL) a new fabrication method for flexible substrates that solves the layer-to-layer alignment problem.

  3. Masks for high aspect ratio x-ray lithography

    SciTech Connect

    Malek, C.K.; Jackson, K.H.; Bonivert, W.D.; Hruby, J.

    1997-04-01

    Fabrication of very high aspect ratio microstructures, as well as ultra-high precision manufacturing is of increasing interest in a multitude of applications. Fields as diverse as micromechanics, robotics, integrated optics, and sensors benefit from this technology. The scale-length of this spatial regime is between what can be achieved using classical machine tool operations and that which is used in microelectronics. This requires new manufacturing techniques, such as the LIGA process, which combines x-ray lithography, electroforming, and plastic molding.

  4. Advanced carbon manufacturing for energy and biological applications

    NASA Astrophysics Data System (ADS)

    Turon Teixidor, Genis

    The science of miniaturization has experienced revolutionary advances during the last decades, witnessing the development of the Integrated Circuit and the emergence of MEMS and Nanotechnology. Particularly, MEMS technology has pioneered the use of non-traditional materials in microfabrication by including polymers, ceramics and composites to the well known list of metals and semiconductors. One of the latest additions to this set of materials is carbon, which represents a very important inclusion given its significance in electrochemical energy conversion systems and in applications where it is used as sensor probe material. For these applications, carbon is optimal in several counts: It has a wide electrochemical stability window, good electrical and thermal conductivity, high corrosion resistance and mechanical stability, and is available in high purity at a low cost. Furthermore carbon is biocompatible. This thesis presents several microfabricated devices that take advantage of these properties. The thesis has two clearly differentiated parts. In the first one, applications of micromachined carbon in the field of energy conversion and energy storage are presented. These applications include lithium ion micro batteries and the development of new carbon electrodes with fractal geometries. In the second part, the focus shifts to biological applications. First, the study of the interaction of living cells with micromachined carbon is presented, followed by the description of a sensor based on interdigitated nano-electrode arrays, and finally the development of the new instrumentation needed to address arrays of carbon electrodes, a multiplexed potentiostat. The underlying theme that connects all these seemingly different topics is the use of carbon microfabrication techniques in electrochemical systems.

  5. Recent advances in medical imaging: anatomical and clinical applications.

    PubMed

    Grignon, Bruno; Mainard, Laurence; Delion, Matthieu; Hodez, Claude; Oldrini, Guillaume

    2012-10-01

    The aim of this paper was to present an overview of the most important recent advances in medical imaging and their potential clinical and anatomical applications. Dramatic changes have been particularly observed in the field of computed tomography (CT) and magnetic resonance imaging (MRI). Computed tomography (CT) has been completely overturned by the successive development of helical acquisition, multidetector and large area-detector acquisition. Visualising brain function has become a new challenge for MRI, which is called functional MRI, currently based principally on blood oxygenation level-dependent sequences, which could be completed or replaced by other techniques such as diffusion MRI (DWI). Based on molecular diffusion due to the thermal energy of free water, DWI offers a spectrum of anatomical and clinical applications, ranging from brain ischemia to visualisation of large fibrous structures of the human body such as the anatomical bundles of white matter with diffusion tensor imaging and tractography. In the field of X-ray projection imaging, a new low-dose device called EOS has been developed through new highly sensitive detectors of X-rays, allowing for acquiring frontal and lateral images simultaneously. Other improvements have been briefly mentioned. Technical principles have been considered in order to understand what is most useful in clinical practice as well as in the field of anatomical applications. Nuclear medicine has not been included.

  6. Recent Advances in Therapeutic Applications of Induced Pluripotent Stem Cells.

    PubMed

    Rami, Farzaneh; Beni, Shamsi Naderi; Kahnamooi, Mahboobeh Mojaver; Rahimmanesh, Ilnaz; Salehi, Ahmad Reza; Salehi, Rasoul

    2017-04-01

    Induced pluripotent stem (iPS) cells are generated by reprogramming of differentiated somatic cells. These cells are identical to human embryonic stem cells (hESCs) in gene expression pattern and the ability to differentiate. iPS cells can be used in in vitro modeling of diseases, testing drugs, assessing gene therapy methods, and cell therapy. Yet, the most important and promising application of iPS cells is in regenerative medicine. Regenerative medicine is a novel area in medicine aiming at the treatment of impaired or lost tissues by replacing them with functional and healthy ones. Currently, organ transplantation, which is considered the only treatment and cure for a number of diseases, is limited by shortage of organ donors and availability of the right match. Therefore, utilization of an alternative source of cells and tissues is critical in transplantation therapy. In this study, we review recent advances in therapeutic application of iPS cells in diseases where organ transplantation remains the only solution and will discuss the potential and usage of iPS cells in different areas of regenerative medicine. The primary theory of using iPS cells in regenerative medicine has brought lots of promises due to its potential for solving the immunological, social, and ethical problems of using ESCs. Nevertheless, several issues and problems have to be resolved before applying iPS cells in therapeutic applications.

  7. Limiting factors to advancing thermal battery technology for naval applications

    NASA Astrophysics Data System (ADS)

    Davis, Patrick B.; Winchester, Clinton S.

    1991-10-01

    Thermal batteries are primary reserve electrochemical power sources using molten salt electrolyte which experience little effective aging while in storage or dormant deployment. Thermal batteries are primarily used in military applications, and are currently used in a wide variety of Navy devices such as missiles, torpedoes, decays, and training targets, usually as power supplies in guidance, propulsion, and Safe/Arm applications. Technology developments have increased the available energy and power density ratings by an order of magnitude in the last ten years. Present thermal batteries, using lithium anodes and metal sulfide cathodes, are capable of performing applications where only less rugged and more expensive silver oxide/zinc or silver/magnesium chloride seawater batteries could serve previously. Additionally, these batteries are capable of supplanting lithium/thionyl chloride reserve batteries in a variety of specifically optimized designs. Increases in thermal battery energy and power density capabilities are not projected to continue with the current available technology. Several battery designs are now at the edge of feasibility and safety. Since future naval systems are likely to require continued growth of battery energy and power densities, there must be significant advances in battery technology. Specifically, anode alloy composition and new cathode materials must be investigated to allow for safe development and deployment of these high power, higher energy density batteries.

  8. The use of advanced materials in space structure applications

    NASA Astrophysics Data System (ADS)

    Eaton, D. C. G.; Slachmuylders, E. J.

    The last decade has seen the Space applications of composite materials become almost commonplace in the construction of configurations requiring high stiffness and/or dimensional stability, particularly in the field of antennas. As experience has been accumulated, applications for load carrying structures utilizing the inherent high specific strength/stiffness of carbon fibres have become more frequent. Some typical examples of these and their design development criteria are reviewed. As these structures and the use of new plastic matrices emerge, considerable attention has to be given to establishing essential integrity control requirements from both safety and cost aspects. The advent of manned European space flight places greater emphasis on such requirements. Attention is given to developments in the fields of metallic structures with discussion of the advantages and disadvantages of their application. The design and development of hot structures, thermal protection systems and air-breathing engines for future launch vehicles necessitates the use of the emerging metal/matrix and other advanced materials. Some of their important features are outlined. Means of achieving such objectives by greater harmonization within Europe are emphasized. Typical examples of on-going activities to promote such collaboration are described.

  9. Cermet-fueled reactors for advanced space applications

    SciTech Connect

    Cowan, C.L.; Palmer, R.S.; Taylor, I.N.; Vaidyanathan, S.; Bhattacharyya, S.K.; Barner, J.O.

    1987-12-01

    Cermet-fueled nuclear reactors are attractive candidates for high-performance advanced space power systems. The cermet consists of a hexagonal matrix of a refractory metal and a ceramic fuel, with multiple tubular flow channels. The high performance characteristics of the fuel matrix come from its high strength at elevated temperatures and its high thermal conductivity. The cermet fuel concept evolved in the 1960s with the objective of developing a reactor design that could be used for a wide range of mobile power generating sytems, including both Brayton and Rankine power conversion cycles. High temperature thermal cycling tests for the cermet fuel were carried out by General Electric as part of the 710 Project (General Electric 1966), and by Argonne National Laboratory in the Direct Nuclear Rocket Program (1965). Development programs for cermet fuel are currently under way at Argonne National Laboratory and Pacific Northwest Laboratory. The high temperature qualification tests from the 1960s have provided a base for the incorporation of cermet fuel in advanced space applications. The status of the cermet fuel development activities and descriptions of the key features of the cermet-fueled reactor design are summarized in this paper.

  10. Recent Advances in Infrasound Science for National Security Applications

    NASA Astrophysics Data System (ADS)

    Arrowsmith, S.; Blom, P. S.; Marcillo, O. E.; Whitaker, R. W.

    2014-12-01

    Infrasound is sound below the frequency-threshold of human hearing, covering the frequency range from 0.01 - 20 Hz. Infrasound science studies the generation, propagation, measurement, and analysis of infrasound. Sources of infrasound include a wide variety of energetic natural and manmade phenomena that include chemical and nuclear explosions, rockets and missiles, and aircraft. The dominant factors influencing the propagation of infrasound are the spatial and temporal variations in temperature, wind speed, and wind direction. In recent years, Infrasound Science has experienced a renaissance due to the installation of an international monitoring system of 60 infrasound arrays for monitoring the Comprehensive Nuclear Test Ban Treaty, and to the demonstrated value of regional infrasound networks for both scientific and applied purposes. Furthermore, in the past decade, significant advances have been made on using measurements of infrasound to invert for these properties of the atmosphere at altitudes where alternative measurement techniques are extremely costly. This presentation provides a review of recent advances in infrasound science as relevant to National Security applications.

  11. Advanced materials and biochemical processes for geothermal applications

    SciTech Connect

    Kukacka, L.E.; van Rooyen, D.; Premuzic, E.T.

    1987-04-01

    Two Geothermal Technology Division (GTD)-sponsored programs: (1) Geothermal Materials Development, and (2) Advanced Biochemical Processes for Geothermal Brines, are described. In the former, work in the following tasks is in progress: (1) high temperature elastomeric materials for dynamic sealing applications, (2) advanced high temperature (300/sup 0/C) lightweight (1.1 g/cc) well cementing materials, (3) thermally conductive composites for heat exchanger tubing, (4) corrosion rates for metals in brine-contaminated binary plant working fluids, and (5) elastomeric liners for well casing. Methods for the utilization and/or the low cost environmentally acceptable disposal of toxic geothermal residues are being developed in the second program. This work is performed in two tasks. In one, microorganisms that can interact with toxic metals found in geothermal residues to convert them into soluble species for subsequent reinjection back into the reservoir or to concentrate them for removal by conventional processes are being identified. In the second task, process conditions are being defined for the encapsulation of untreated or partially biochemically treated residues in Portland cement-based formulations and the subsequent utilization of the waste fractions in building materials. Both processing methods yield materials which appear to meet disposal criteria for non-toxic solid waste, and their technical and economic feasibilities have been established.

  12. Evaluation of undeveloped rocket engine cycle applications to advanced transportation

    NASA Technical Reports Server (NTRS)

    1990-01-01

    Undeveloped pump-fed, liquid propellant rocket engine cycles were assessed and evaluated for application to Next Manned Transportation System (NMTS) vehicles, which would include the evolving Space Transportation System (STS Evolution), the Personnel Launch System (PLS), and the Advanced Manned Launch System (AMLS). Undeveloped engine cycles selected for further analysis had potential for increased reliability, more maintainability, reduced cost, and improved (or possibly level) performance when compared to the existing SSME and proposed STME engines. The split expander (SX) cycle, the full flow staged combustion (FFSC) cycle, and a hybrid version of the FFSC, which has a LOX expander drive for the LOX pump, were selected for definition and analysis. Technology requirements and issues were identified and analyses of vehicle systems weight deltas using the SX and FFSC cycles in AMLS vehicles were performed. A strawman schedule and cost estimate for FFSC subsystem technology developments and integrated engine system demonstration was also provided.

  13. Development of Advanced Robotic Hand System for space application

    NASA Technical Reports Server (NTRS)

    Machida, Kazuo; Akita, Kenzo; Mikami, Tatsuo; Komada, Satoru

    1994-01-01

    The Advanced Robotic Hand System (ARH) is a precise telerobotics system with a semi dexterous hand for future space application. The ARH will be tested in space as one of the missions of the Engineering Tests Satellite 7 (ETS-7) which will be launched in 1997. The objectives of the ARH development are to evaluate the capability of a possible robot hand for precise and delicate tasks and to validate the related technologies implemented in the system. The ARH is designed to be controlled both from ground as a teleoperation and by locally autonomous control. This paper presents the overall system design and the functional capabilities of the ARH as well as its mission outline as the preliminary design has been completed.

  14. Joining SI3N4 for Advanced Turbomachinery Applications

    SciTech Connect

    GLASS, S. JILL; LOEHMAN, RONALD E.; HOSKING, F. MICHAEL; STEPHENS JR., JOHN J.; VIANCO, PAUL T.; NEILSEN, MICHAEL K.; WALKER, CHARLES A.; POLLINGER, J.P.; MAHONEY, F.M.; QUILLEN, B.G.

    2000-07-01

    The main objective of this project was to develop reliable, low-cost techniques for joining silicon nitride (Si{sub 3}N{sub 4}) to itself and to metals. For Si{sub 3}N{sub 4} to be widely used in advanced turbomachinery applications, joining techniques must be developed that are reliable, cost-effective, and manufacturable. This project addressed those needs by developing and testing two Si{sub 3}N{sub 4} joining systems; oxynitride glass joining materials and high temperature braze alloys. Extensive measurements were also made of the mechanical properties and oxidation resistance of the braze materials. Finite element models were used to predict the magnitudes and positions of the stresses in the ceramic regions of ceramic-to-metal joints sleeve and butt joints, similar to the geometries used for stator assemblies.

  15. Applications of Isotopes in Advancing Structural & Functional Heparanomics

    PubMed Central

    Tran, Vy M.; Nu Nguyen, Thao Kim; Raman, Karthik; Kuberan, Balagurunathan

    2011-01-01

    Heparanomics is the study of all the biologically active oligosaccharide domain structures in the entire heparanome and the nature of interactions among these domains and their protein ligands. Structural elucidation of heparan sulfate and heparin oligosaccharides is a major obstacle in advancing structure-function relationships and the study of heparanomics. There are several factors that exacerbate challenges involved in the structural elucidation of heparin and heparan sulfate. Therefore, there is a great interest in developing novel strategies and analytical tools to overcome the barriers in decoding the enigmatic heparanome. This review article focuses on the applications of isotopes, both radioisotopes and stable isotopes, in the structural elucidation of the complex heparanome at the disaccharide or oligosaccharide level using liquid chromatography, nuclear magnetic resonance spectroscopy and mass spectrometry. This review article also outlines the utility of isotopes in determining the substrate specificity of biosynthetic enzymes that eventually dictate the emergence of biologically active oligosaccharides. PMID:20838780

  16. Recent advances in bioprinting techniques: approaches, applications and future prospects.

    PubMed

    Li, Jipeng; Chen, Mingjiao; Fan, Xianqun; Zhou, Huifang

    2016-09-20

    Bioprinting technology shows potential in tissue engineering for the fabrication of scaffolds, cells, tissues and organs reproducibly and with high accuracy. Bioprinting technologies are mainly divided into three categories, inkjet-based bioprinting, pressure-assisted bioprinting and laser-assisted bioprinting, based on their underlying printing principles. These various printing technologies have their advantages and limitations. Bioprinting utilizes biomaterials, cells or cell factors as a "bioink" to fabricate prospective tissue structures. Biomaterial parameters such as biocompatibility, cell viability and the cellular microenvironment strongly influence the printed product. Various printing technologies have been investigated, and great progress has been made in printing various types of tissue, including vasculature, heart, bone, cartilage, skin and liver. This review introduces basic principles and key aspects of some frequently used printing technologies. We focus on recent advances in three-dimensional printing applications, current challenges and future directions.

  17. Application of advanced technology to future long-range aircraft

    NASA Technical Reports Server (NTRS)

    Schrader, O. E.

    1976-01-01

    The objective of this paper is to provide an overview assessment of three separate programs at Langley Research Center that have incorporated advanced technology into the design of long-range passenger and cargo aircraft. The first technology centers around the use of an span-loaded cargo aircraft with the payload distributed along the wing. This concept has the potential for reduced structural weights. The second technology is the application of laminar flow control (LFC) to the aircraft to reduce the aerodynamic drag. The use of LFC can reduce the fuel requirements during long-range cruise. The last program evaluates the production of alternate aircraft fuels from coal and the use of liquid hydrogen as an aircraft fuel. Coal-derived hydrogen as an aircraft fuel offers both the prospect for reduced dependence on petroleum fuels and improved performance for long-range aircraft.

  18. Advances in applications and methodology for aerial infrared thermography

    NASA Astrophysics Data System (ADS)

    Stockton, Gregory R.

    2004-04-01

    Most aerial infrared (IR) is performed by the military, but there are commercial uses. Some of these non-military applications are the focus of this paper. Generally speaking, the farther away one can get from the object of an infrared survey, while maintaining the needed spatial resolution and thermal sensitivity, the more usable the data is. Wide areas and large objects can be effectively imaged from the air. In fact, the use of high-resolution aerial infrared imagery is often the only way that one can see slight nuances of temperature differences and trace the patterns of heat. In order to produce an easy to understand, high quality and useable report, the data must be acquired, recorded and processed in an efficient and effective way. This paper discusses the ongoing advances in methodology, platform and equipment required to produce high quality usable data for the end-user.

  19. Advanced Power Batteries for Renewable Energy Applications 3.09

    SciTech Connect

    Shane, Rodney

    2011-12-01

    This report describes the research that was completed under project title Advanced Power Batteries for Renewable Energy Applications 3.09, Award Number DE-EE0001112. The report details all tasks described in the Statement of Project Objectives (SOPO). The SOPO includes purchasing of test equipment, designing tooling, building cells and batteries, testing all variables and final evaluation of results. The SOPO is included. There were various types of tests performed during the project, such as; gas collection, float current monitoring, initial capacity, high rate partial state of charge (HRPSoC), hybrid pulse power characterization (HPPC), high rate capacity, corrosion, software modeling and solar life cycle tests. The grant covered a period of two years starting October 1, 2009 and ending September 30, 2011.

  20. Graph mining: procedure, application to drug discovery and recent advances.

    PubMed

    Takigawa, Ichigaku; Mamitsuka, Hiroshi

    2013-01-01

    Combinatorial chemistry has generated chemical libraries and databases with a huge number of chemical compounds, which include prospective drugs. Chemical structures of compounds can be molecular graphs, to which a variety of graph-based techniques in computer science, specifically graph mining, can be applied. The most basic way for analyzing molecular graphs is using structural fragments, so-called subgraphs in graph theory. The mainstream technique in graph mining is frequent subgraph mining, by which we can retrieve essential subgraphs in given molecular graphs. In this article we explain the idea and procedure of mining frequent subgraphs from given molecular graphs, raising some real applications, and we describe the recent advances of graph mining.

  1. Recent advances in bioprocessing application of membrane chromatography.

    PubMed

    Orr, Valerie; Zhong, Luyang; Moo-Young, Murray; Chou, C Perry

    2013-01-01

    Compared to traditional chromatography using resins in packed-bed columns, membrane chromatography is a relatively new and immature bioseparation technology based on the integration of membrane filtration and liquid chromatography into a single-stage operation. Over the past decades, advances in membrane chemistry have yielded novel membrane devices with high binding capacities and improved mass transfer properties, significantly increasing the bioprocessing efficiency for purification of biomolecules. Due to the disposable nature, low buffer consumption, and reduced equipment costs, membrane chromatography can significantly reduce downstream bioprocessing costs. In this review, we discuss technological merits and disadvantages associated with membrane chromatography as well as recent bioseparation applications with a particular attention on purification of large biomolecules.

  2. Advanced targets, diagnostics and applications of laser-generated plasmas

    NASA Astrophysics Data System (ADS)

    Torrisi, L.

    2015-04-01

    High-intensity sub-nanosecond-pulsed lasers irradiating thin targets in vacuum permit generation of electrons and ion acceleration and high photon yield emission in non-equilibrium plasmas. At intensities higher than 1015 W/cm2 thin foils can be irradiated in the target-normal sheath acceleration regime driving ion acceleration in the forward direction above 1 MeV per charge state. The distributions of emitted ions in terms of energy, charge state and angular emission are controlled by laser parameters, irradiation conditions, target geometry and composition. Advanced targets can be employed to increase the laser absorption in thin foils and to enhance the energy and the yield of the ion acceleration process. Semiconductor detectors, Thomson parabola spectrometer and streak camera can be employed as online plasma diagnostics to monitor the plasma parameters, shot by shot. Some applications in the field of the multiple ion implantation, hadrontherapy and nuclear physics are reported.

  3. Development of high viscosity coatings for advanced Space Shuttle applications

    NASA Technical Reports Server (NTRS)

    Garofalini, S. H.; Banas, R.; Creedon, J.

    1979-01-01

    Laboratory studies for increasing the thermal resistance of high viscosity coatings for silica reusable surface insulation are presented. The coatings are intended for the reentry temperature associated with advanced Space Shuttle applications which will involve aerodynamic shear forces during entry from earth orbits. Coating viscosity was increased by (1) reduction in the concentration of the low viscosity additive B2O3; (2) reduction in the particle size of the constituent powders in coatings; and (3) addition of a high viscosity glass former (GeO2). A coating system was produced by combining the three methods which showed apparent higher viscosity than the current coating, while satisfying all the current Shuttle Orbiter coating requirements.

  4. Marine biotechnology advances towards applications in new functional foods.

    PubMed

    Freitas, Ana C; Rodrigues, Dina; Rocha-Santos, Teresa A P; Gomes, Ana M P; Duarte, Armando C

    2012-01-01

    The marine ecosystem is still an untapped reservoir of biologically active compounds, which have considerable potential to supply food ingredients towards development of new functional foods. With the goal of increasing the availability and chemical diversity of functional marine ingredients, much research has been developed using biotechnological tools to discover and produce new compounds. This review summarizes the advances in biotechnological tools for production of functional ingredients, including enzymes, for the food industry. Tools involving biotechnological processes (bioreactors, fermentations, bioprocessing) and those involving genetic research designated as molecular biotechnology are discussed highlighting how they can be used in the controlled manipulation and utilization of marine organisms as sources of food ingredients, as well as discussing the most relevant shortcomings towards applications in new functional foods.

  5. Experiments applications guide: Advanced Communications Technology Satellite (ACTS)

    NASA Technical Reports Server (NTRS)

    1988-01-01

    This applications guide first surveys the capabilities of the Advanced Communication Technology Satellite (ACTS) system (both the flight and ground segments). This overview is followed by a description of the baseband processor (BBP) and microwave switch matrix (MSM) operating modes. Terminals operating with the baseband processor are referred to as low burst rate (LBR); and those operating with the microwave switch matrix, as high burst rate (HBR). Three very small-aperture terminals (VSATs), LBR-1, LBR-2, and HBR, are described for various ACTS operating modes. Also described is the NASA Lewis link evaluation terminal. A section on ACTS experiment opportunities introduces a wide spectrum of network control, telecommunications, system, and scientific experiments. The performance of the VSATs is discussed in detail. This guide is intended as a catalyst to encourage participation by the telecommunications, business, and science communities in a broad spectrum of experiments.

  6. Fabrication and application of advanced functional materials from lignincellulosic biomass

    NASA Astrophysics Data System (ADS)

    Hu, Sixiao

    This dissertation explored the conversion of lignocellulosic biomass into advanced functional materials and their potential applications. Lignocellulosic biomass represents an as-of-yet underutilized renewable source for not only biofuel production but also functional materials fabrication. This renewable source is a great alternative for fossil fuel based chemicals, which could be one of the solutions to energy crisis. In this work, it was demonstrated a variety of advanced materials including functional carbons, metal and silica nanoparticles could be derived from lignocellulosic biomass. Chapter 1 provided overall reviewed of the lignin structures, productions and its utilizations as plastics, absorbents and carbons, as well as the preparation of nano-structured silver, silica and silicon carbide/nitride from biomass. Chapter 2, 3 and 4 discussed the fabrication of highly porous carbons from isolated lignin, and their applications as electric supercapacitors for energy storage. In chapter 2, ultrafine porous carbon fibers were prepared via electrospinning followed by simultaneous carbonization and activation. Chapter 3 covered the fabrication of supercapacitor based on the porous carbon fibers and the investigation of their electrochemical performances. In chapter 4, porous carbon particulates with layered carbon nano plates structures were produced by simple oven-drying followed by simultaneous carbonization and activation. The effects of heat processing parameters on the resulting carbon structures and their electrochemical properties were discussed in details. Chapter 5 and 6 addressed the preparation of silver nanoparticles using lignin. Chapter 5 reported the synthesis, underlying kinetics and mechanism of monodispersed silver nanospheres with diameter less than 25 nm in aqueous solutions using lignin as dual reducing and capping agents. Chapter 6 covered the preparation of silver nanoparticles on electrospun celluloses ultrafine fibers using lignin as both

  7. Cubic Silsesquioxanes as a Green, High-Performance Mold Material for Nanoimprint Lithography

    SciTech Connect

    Ro, Hyun W.; Popova, Vera; Chen, Lei; Forster, Aaron M.; Ding, Yifu; Alvine, Kyle J.; Krug, Dave J.; Laine, Richard M.; Soles, Christopher L.

    2010-08-16

    Optical lithography deep in the UV spectrum is the predominate route for high-resolution, high-volume nanoscale pattering. However, state-of-the-art optical lithography tools are exceedingly expensive and this places serious limitations on the applications, technical sectors, and markets where highresolution patterning can be implemented. To date the only substantial market for high-end optical lithography tools has been semiconductor fabrication. Nanoimprint lithography (NIL) has recently emerged as an alternative to optical lithography and combines the potential of sub-fi ve-nanometer patterning resolution with the low cost and simplicity of a stamping process. [ 1–4 ] This has led to signifi cant efforts to implement NIL methods, not only for semiconductor logic devices, but also in fi elds as diverse as the direct patterning of interlayer dielectrics (ILDs) for back-end-of-line (BEOL) interconnect structures, [ 5–7 ] bitpatterned magnetic media for data storage, [ 8 , 9 ] and high-brightness light-emitting diodes (LEDs). [ 10 ] Some of these are new areas where nanoscale patterning has previously not been considered, and are made possible here by the low cost and simplicity of the NIL stamping processes.

  8. Advanced Life Systems for Extreme Environments: An Arctic Application

    NASA Technical Reports Server (NTRS)

    Lewis, Carol E.; Stanford, Kerry L.; Bubenheim, David L.; Covington, Alan (Technical Monitor)

    1995-01-01

    The problems of obtaining adequate pure drinking water and disposing of liquid and solid waste in the U.S. Arctic, a region where virtually all water is frozen solid for much of the year, has led to unsanitary solutions (U.S. Arctic Research Commission). These solutions are also damaging to the environment. Sanitation and a safe water supply are particularly problems in rural villages. About one-fourth of Alaska's 86.000 Native residents live in these communities. They are without running water and use plastic buckets for toilets. The outbreak of diseases is believed to be partially attributable to exposure to human waste. Villages with the most frequent outbreaks of disease are those in which running water is difficult to obtain (Office of Technology Assessment, 1994). Waste is emptied into open lagoons, rivers, or onto the sea coast. It does not degrade rapidly and in addition to affecting human health, can be harmful to the fragile ecology of the Arctic and the indigenous wildlife and fish populations. Advanced Life Systems for Extreme Environments (ALSEE) provides a solution to sanitation and safe water problems. The system uses an advanced integrated technology developed for Antarctic and space applications. ALSEE uses the systems approach to address more than waste and water problems. By incorporating hydroponic horticulture and aquaculture into the waste treatment system, ALSEE addresses the quality and quantity of fresh foods available to Arctic residents. A temperate climate is required for year-round plant growth. ALSEE facilities can be designed to include a climate controlled area within the structure. This type of environment is a change from the long periods of darkness and cold found in the Arctic and can help alleviate stress so often associated with these extremes. While the overall concept of ALSEE projects is advanced, system facilities can be operated by village residents with appropriate training. ALSEE provides continuing training and

  9. Recent advances and applications of probabilistic topic models

    NASA Astrophysics Data System (ADS)

    Wood, Ian

    2014-12-01

    I present here an overview of recent advances in probabilistic topic modelling and related Bayesian graphical models as well as some of their more atypical applications outside of their home: text analysis. These techniques allow the modelling of high dimensional count vectors with strong correlations. With such data, simply calculating a correlation matrix is infeasible. Probabilistic topic models address this using mixtures of multinomials estimated via Bayesian inference with Dirichlet priors. The use of conjugate priors allows for efficient inference, and these techniques scale well to data sets with many millions of vectors. The first of these techniques to attract significant attention was Latent Dirichlet Allocation (LDA) [1, 2]. Numerous extensions and adaptations of LDA have been proposed: non-parametric models; assorted models incorporating authors, sentiment and other features; models regularised through the use of extra metadata or extra priors on topic structure, and many more [3]. They have become widely used in the text analysis and population genetics communities, with a number of compelling applications. These techniques are not restricted to text analysis, however, and can be applied to other types of data which can be sensibly discretised and represented as counts of labels/properties/etc. LDA and it's variants have been used to find patterns in data from diverse areas of inquiry, including genetics, plant physiology, image analysis, social network analysis, remote sensing and astrophysics. Nonetheless, it is relatively recently that probabilistic topic models have found applications outside of text analysis, and to date few such applications have been considered. I suggest that there is substantial untapped potential for topic models and models inspired by or incorporating topic models to be fruitfully applied, and outline the characteristics of systems and data for which this may be the case.

  10. High-resolution nanopatterning of biodegradable polylactide by thermal nanoimprint lithography using gas permeable mold

    NASA Astrophysics Data System (ADS)

    Takei, Satoshi; Hanabata, Makoto

    2017-03-01

    We report high-resolution (150 nm) nanopatterning of biodegradable polylactide by thermal nanoimprint lithography using dichloromethane as a volatile solvent for improving the liquidity and a porous cyclodextrin-based gas-permeable mold. This study demonstrates the high-resolution patterning of polylactic acid and other non-liquid functional materials with poor fluidity by thermal nanoimprinting. Such a patterning is expected to expand the utility of thermal nanoimprint lithography and fabricate non-liquid functional materials suitable for eco-friendly and biomedical applications.

  11. Self-aligned grating couplers on template-stripped metal pyramids via nanostencil lithography

    NASA Astrophysics Data System (ADS)

    Klemme, Daniel J.; Johnson, Timothy W.; Mohr, Daniel A.; Oh, Sang-Hyun

    2016-05-01

    We combine nanostencil lithography and template stripping to create self-aligned patterns about the apex of ultrasmooth metal pyramids with high throughput. Three-dimensional patterns such as spiral and asymmetric linear gratings, which can couple incident light into a hot spot at the tip, are presented as examples of this fabrication method. Computer simulations demonstrate that spiral and linear diffraction grating patterns are both effective at coupling light to the tip. The self-aligned stencil lithography technique can be useful for integrating plasmonic couplers with sharp metallic tips for applications such as near-field optical spectroscopy, tip-based optical trapping, plasmonic sensing, and heat-assisted magnetic recording.

  12. Fabrication of 2D and 3D photonic structures using laser lithography

    NASA Astrophysics Data System (ADS)

    Gaso, P.; Jandura, D.; Pudis, D.

    2016-12-01

    In this paper we demonstrate possibilities of three-dimensional (3D) printing technology based on two photon polymerization. We used three-dimensional dip-in direct-laser-writing (DLW) optical lithography to fabricate 2D and 3D optical structures for optoelectronics and for optical sensing applications. DLW lithography allows us use a non conventional way how to couple light into the waveguide structure. We prepared ring resonator and we investigated its transmission spectral characteristic. We present 3D inverse opal structure from its design to printing and scanning electron microscope (SEM) imaging. Finally, SEM images of some prepared photonic crystal structures were performed.

  13. Submicrometer photonic structure fabrication by phase spatial-light-modulator-based interference lithography.

    PubMed

    Behera, Saraswati; Kumar, Manish; Joseph, Joby

    2016-04-15

    We present a large-area and single-step fabrication approach based on phase spatial light modulator (SLM)-assisted interference lithography for the realization of submicrometer photonic structures on photoresist. A multimirror beam steering unit is used to reflect the SLM-generated phase-engineered beams leading to a large angle between interfering beams while also preserving the large area of the interfering plane beams. Both translational and rotational periodic submicrometer structures are experimentally realized. This approach increases the flexibility of interference lithography to fabricate more complex submicrometer photonic structures and photonic metamaterial structures for future applications.

  14. Self-aligned grating couplers on template-stripped metal pyramids via nanostencil lithography.

    PubMed

    Klemme, Daniel J; Johnson, Timothy W; Mohr, Daniel A; Oh, Sang-Hyun

    2016-05-23

    We combine nanostencil lithography and template stripping to create self-aligned patterns about the apex of ultrasmooth metal pyramids with high throughput. Three-dimensional patterns such as spiral and asymmetric linear gratings, which can couple incident light into a hot spot at the tip, are presented as examples of this fabrication method. Computer simulations demonstrate that spiral and linear diffraction grating patterns are both effective at coupling light to the tip. The self-aligned stencil lithography technique can be useful for integrating plasmonic couplers with sharp metallic tips for applications such as near-field optical spectroscopy, tip-based optical trapping, plasmonic sensing, and heat-assisted magnetic recording.

  15. Rapid fabrication of microfluidic chips based on the simplest LED lithography

    NASA Astrophysics Data System (ADS)

    Li, Yue; Wu, Ping; Luo, Zhaofeng; Ren, Yuxuan; Liao, Meixiang; Feng, Lili; Li, Yuting; He, Liqun

    2015-05-01

    Microfluidic chips are generally fabricated by a soft lithography method employing commercial lithography equipment. These heavy machines require a critical room environment and high lamp power, and the cost remains too high for most normal laboratories. Here we present a novel microfluidics fabrication method utilizing a portable ultraviolet (UV) LED as an alternative UV source for photolithography. With this approach, we can repeat several common microchannels as do these conventional commercial exposure machines, and both the verticality of the channel sidewall and lithography resolution are proved to be acceptable. Further microfluidics applications such as mixing, blood typing and microdroplet generation are implemented to validate the practicability of the chips. This simple but innovative method decreases the cost and requirement of chip fabrication dramatically and may be more popular with ordinary laboratories.

  16. Fabrication of moth-eye structures on silicon by direct six-beam laser interference lithography

    SciTech Connect

    Xu, Jia; Zhang, Ziang; Weng, Zhankun; Wang, Zuobin Wang, Dapeng

    2014-05-28

    This paper presents a new method for the generation of cross-scale laser interference patterns and the fabrication of moth-eye structures on silicon. In the method, moth-eye structures were produced on a surface of silicon wafer using direct six-beam laser interference lithography to improve the antireflection performance of the material surface. The periodic dot arrays of the moth-eye structures were formed due to the ablation of the irradiance distribution of interference patterns on the wafer surface. The shape, size, and distribution of the moth-eye structures can be adjusted by controlling the wavelength, incidence angles, and exposure doses in a direct six-beam laser interference lithography setup. The theoretical and experimental results have shown that direct six-beam laser interference lithography can provide a way to fabricate cross-scale moth-eye structures for antireflection applications.

  17. "Multipoint Force Feedback" Leveling of Massively Parallel Tip Arrays in Scanning Probe Lithography.

    PubMed

    Noh, Hanaul; Jung, Goo-Eun; Kim, Sukhyun; Yun, Seong-Hun; Jo, Ahjin; Kahng, Se-Jong; Cho, Nam-Joon; Cho, Sang-Joon

    2015-09-16

    Nanoscale patterning with massively parallel 2D array tips is of significant interest in scanning probe lithography. A challenging task for tip-based large area nanolithography is maintaining parallel tip arrays at the same contact point with a sample substrate in order to pattern a uniform array. Here, polymer pen lithography is demonstrated with a novel leveling method to account for the magnitude and direction of the total applied force of tip arrays by a multipoint force sensing structure integrated into the tip holder. This high-precision approach results in a 0.001° slope of feature edge length variation over 1 cm wide tip arrays. The position sensitive leveling operates in a fully automated manner and is applicable to recently developed scanning probe lithography techniques of various kinds which can enable "desktop nanofabrication."

  18. Fabrication of moth-eye structures on silicon by direct six-beam laser interference lithography

    NASA Astrophysics Data System (ADS)

    Xu, Jia; Wang, Zuobin; Zhang, Ziang; Wang, Dapeng; Weng, Zhankun

    2014-05-01

    This paper presents a new method for the generation of cross-scale laser interference patterns and the fabrication of moth-eye structures on silicon. In the method, moth-eye structures were produced on a surface of silicon wafer using direct six-beam laser interference lithography to improve the antireflection performance of the material surface. The periodic dot arrays of the moth-eye structures were formed due to the ablation of the irradiance distribution of interference patterns on the wafer surface. The shape, size, and distribution of the moth-eye structures can be adjusted by controlling the wavelength, incidence angles, and exposure doses in a direct six-beam laser interference lithography setup. The theoretical and experimental results have shown that direct six-beam laser interference lithography can provide a way to fabricate cross-scale moth-eye structures for antireflection applications.

  19. Lithography oriented DfM for 65 nm and beyond

    NASA Astrophysics Data System (ADS)

    Kyoh, S.; Kotani, T.; Kobayashi, S.; Ikeuchi, A.; Inoue, S.

    2006-03-01

    As Technology node is advancing, we are forced to use relatively low resolution lithography tool. And these situation results in degradation of pattern fidelity. hot spot, lithographic margin-less spot, appears frequently by conventional design rule methodology. We propose two design rule methodology to manage hot spot appearances in the stage of physical pattern determination. One is restricted design rule, under which pattern variation is very limited, so hot spot generation can be fully controlled. Second is complex design rule combined with lithography compliance check (LCC) and hot spot fixing (HSF). Design rule, by itself, has a limited ability to reduce hot spot generation. To compensate the limited ability, both LCC including optical proximity correction and process simulation for detecting hot spots and HSF for fixing the detected hot spots are required. Implementing those methodology into design environment, hot spot management can be done by early stage of physical pattern determination. Also newly developed tool is introduced to help designers easily fixing hot spots. By using this tool, the system of automatic LCC and HSF has been constructed. hot spots-less physical patterns through this system can be easily obtained and turn-back from manufacture to design can be avoided.

  20. Roll-to-Roll Nanoimprint Lithography Simulations for Flexible Substrates

    NASA Astrophysics Data System (ADS)

    Spann, Andrew; Jain, Akhilesh; Bonnecaze, Roger

    2015-11-01

    UV roll-to-roll nanoimprint lithography enables the patterning of features onto a flexible substrate for bendable electronics in a continuous process. One of the most important design goals in this process is to make the residual layer thickness of the photoresist in unpatterned regions as thin and uniform as possible. Another important goal is to minimize the imprint time to maximize throughput. We develop a multi-scale model to simulate the spreading of photoresist drops as the template is pressed against the substrate. We include the effect of capillary pressure on the bending of the substrate and show how this distorts uniformity in the residual thickness layer. Our simulation code is parallelized and can simulate the flow and merging of thousands of drops. We investigate the effect of substrate tension and the initial arrangement of drops on the residual layer thickness and imprint time. We find that for a given volume of photoresist, distributing that volume to more drops initially decreases the imprint time. We conclude with recommendations for scale-up and optimal operations of roll-to-roll nanoimprint lithography systems. The authors acknowledge the Texas Advanced Computing Center at The University of Texas at Austin for providing high performance computing resources.

  1. High efficiency diffraction grating for EUV lithography beamline monochromator

    NASA Astrophysics Data System (ADS)

    Voronov, D. L.; Warwick, T.; Gullikson, E. M.; Salmassi, F.; Naulleau, P.; Artemiev, N. A.; Lum, P.; Padmore, H. A.

    2016-09-01

    A blazed diffraction grating for the EUV lithography Beamline 12.0.1 of the Advanced Light Source has been fabricated using optical direct write lithography and anisotropic wet etching technology. A variable line spacing pattern was recorded on a photoresist layer and transferred to a hard mask layer of the grating substrate by a plasma etch. Then anisotropic wet etching was applied to shape triangular grating grooves with precise control of the ultralow blaze angle. Variation of the groove density along the grating length was measured with a Long Trace Profiler (LTP). Fourier analysis of the LTP data confirmed high groove placement accuracy of the grating. The grating coated with a Ru coating demonstrated diffraction efficiency of 69.6% in the negative first diffraction order which is close to theoretical efficiency at the wavelength of 13.5 nm. This work demonstrates an alternative approach to fabrication of highly efficient and precise x-ray diffraction gratings with ultra-low blaze angles.

  2. Results of advanced battery technology evaluations for electric vehicle applications

    SciTech Connect

    DeLuca, W.H.; Gillie, K.R.; Kulaga, J.E.; Smaga, J.A.; Tummillo, A.F.; Webster, C.E.

    1992-09-01

    Advanced battery technology evaluations are performed under simulated electric-vehicle operating conditions at the Analysis & Diagnostic Laboratory (ADL) of Argonne National Laboratory. The ADL results provide insight Into those factors that limit battery performance and life. The ADL facilities include a test laboratory to conduct battery experimental evaluations under simulated application conditions and a post-test analysis laboratory to determine, In a protected atmosphere if needed, component compositional changes and failure mechanisms. This paper summarizes the performance characterizations and life evaluations conducted during 1991--1992 on both single cells and multi-cell modules that encompass eight battery technologies [Na/S, Li/MS (M=metal), Ni/MH, Ni/Cd, Ni/Zn, Ni/Fe, Zn/Br, and Pb-acid]. These evaluations were performed for the Department of Energy, Office of Transportation Technologies, Electric and Hybrid Propulsion Division, and the Electric Power Research Institute. The ADL provides a common basis for battery performance characterization and life evaluations with unbiased application of tests and analyses. The results help identify the most-promising R&D approaches for overcoming battery limitations, and provide battery users, developers, and program managers with a measure of the progress being made in battery R&D programs, a comparison of battery technologies, and basic data for modeling.

  3. Next-generation sequencing: advances and applications in cancer diagnosis

    PubMed Central

    Serratì, Simona; De Summa, Simona; Pilato, Brunella; Petriella, Daniela; Lacalamita, Rosanna; Tommasi, Stefania; Pinto, Rosamaria

    2016-01-01

    Technological advances have led to the introduction of next-generation sequencing (NGS) platforms in cancer investigation. NGS allows massive parallel sequencing that affords maximal tumor genomic assessment. NGS approaches are different, and concern DNA and RNA analysis. DNA sequencing includes whole-genome, whole-exome, and targeted sequencing, which focuses on a selection of genes of interest for a specific disease. RNA sequencing facilitates the detection of alternative gene-spliced transcripts, posttranscriptional modifications, gene fusion, mutations/single-nucleotide polymorphisms, small and long noncoding RNAs, and changes in gene expression. Most applications are in the cancer research field, but lately NGS technology has been revolutionizing cancer molecular diagnostics, due to the many advantages it offers compared to traditional methods. There is greater knowledge on solid cancer diagnostics, and recent interest has been shown also in the field of hematologic cancer. In this review, we report the latest data on NGS diagnostic/predictive clinical applications in solid and hematologic cancers. Moreover, since the amount of NGS data produced is very large and their interpretation is very complex, we briefly discuss two bioinformatic aspects, variant-calling accuracy and copy-number variation detection, which are gaining a lot of importance in cancer-diagnostic assessment. PMID:27980425

  4. Stimulus-responsive hydrogels: Theory, modern advances, and applications

    PubMed Central

    Koetting, Michael C.; Peters, Jonathan T.; Steichen, Stephanie D.; Peppas, Nicholas A.

    2016-01-01

    Over the past century, hydrogels have emerged as effective materials for an immense variety of applications. The unique network structure of hydrogels enables very high levels of hydrophilicity and biocompatibility, while at the same time exhibiting the soft physical properties associated with living tissue, making them ideal biomaterials. Stimulus-responsive hydrogels have been especially impactful, allowing for unprecedented levels of control over material properties in response to external cues. This enhanced control has enabled groundbreaking advances in healthcare, allowing for more effective treatment of a vast array of diseases and improved approaches for tissue engineering and wound healing. In this extensive review, we identify and discuss the multitude of response modalities that have been developed, including temperature, pH, chemical, light, electro, and shear-sensitive hydrogels. We discuss the theoretical analysis of hydrogel properties and the mechanisms used to create these responses, highlighting both the pioneering and most recent work in all of these fields. Finally, we review the many current and proposed applications of these hydrogels in medicine and industry. PMID:27134415

  5. Advances in wearable technology and its medical applications.

    PubMed

    Bonato, Paolo

    2010-01-01

    The concept of monitoring individuals in the home and community settings was introduced more than 50 years ago, when Holter monitoring was proposed (in the late 1940s) and later adopted (in the 1960s) as a clinical tool. However, technologies to fully enable such vision were lacking and only sporadic and rather obtrusive monitoring techniques were available for several decades. Over the past decade, we have witnessed a great deal of progress in the field of wearable sensors and systems. Advances in this field have finally provided the tools to implement and deploy technology with the capabilities required by researchers in the field of patients' home monitoring. These technologies provide the tools to achieve early diagnosis of diseases such as congestive heart failure, prevention of chronic conditions such as diabetes, improved clinical management of neurodegenerative conditions such as Parkinson's disease, and the ability to promptly respond to emergency situations such as seizures in patients with epilepsy and cardiac arrest in subjects undergoing cardiovascular monitoring. Current research efforts are focused on the development of systems enabling clinical applications. The current focus on developing and deploying wearable systems targeting specific clinical applications has the potential of leading to clinical adoption within the next five to ten years.

  6. Results of advanced battery technology evaluations for electric vehicle applications

    NASA Astrophysics Data System (ADS)

    Deluca, W. H.; Gillie, K. R.; Kulaga, J. E.; Smaga, J. A.; Tummillo, A. F.; Webster, C. E.

    1992-10-01

    Advanced battery technology evaluations are performed under simulated electric-vehicle operating conditions at the Analysis and Diagnostic Laboratory (ADL) of Argonne National Laboratory. The ADL results provide insight into those factors that limit battery performance and life. The ADL facilities include a test laboratory to conduct battery experimental evaluations under simulated application conditions and a post-test analysis laboratory to determine, in a protected atmosphere if needed, component compositional changes and failure mechanisms. This paper summarizes the performance characterizations and life evaluations conducted during 1991-1992 on both single cells and multi-cell modules that encompass eight battery technologies (Na/S, Li/MS (M=metal), Ni/MH, Ni/Cd, Ni/Zn, Ni/Fe, Zn/Br, and Pb-acid). These evaluations were performed for the Department of Energy, Office of Transportation Technologies, Electric and Hybrid Propulsion Division, and the Electric Power Research Institute. The ADL provides a common basis for battery performance characterization and life evaluations with unbiased application of tests and analyses. The results help identify the most-promising R&D approaches for overcoming battery limitations, and provide battery users, developers, and program managers with a measure of the progress being made in battery R&D programs, a comparison of battery technologies, and basic data for modeling.

  7. Advanced fuel cells for transportation applications. Final report

    SciTech Connect

    1998-02-10

    This Research and Development (R and D) contract was directed at developing an advanced technology compressor/expander for supplying compressed air to Proton Exchange Membrane (PEM) fuel cells in transportation applications. The objective of this project was to develop a low-cost high-efficiency long-life lubrication-free integrated compressor/expander utilizing scroll technology. The goal of this compressor/expander was to be capable of providing compressed air over the flow and pressure ranges required for the operation of 50 kW PEM fuel cells in transportation applications. The desired ranges of flow, pressure, and other performance parameters were outlined in a set of guidelines provided by DOE. The project consisted of the design, fabrication, and test of a prototype compressor/expander module. The scroll CEM development program summarized in this report has been very successful, demonstrating that scroll technology is a leading candidate for automotive fuel cell compressor/expanders. The objectives of the program are: develop an integrated scroll CEM; demonstrate efficiency and capacity goals; demonstrate manufacturability and cost goals; and evaluate operating envelope. In summary, while the scroll CEM program did not demonstrate a level of performance as high as the DOE guidelines in all cases, it did meet the overriding objectives of the program. A fully-integrated, low-cost CEM was developed that demonstrated high efficiency and reliable operation throughout the test program. 26 figs., 13 tabs.

  8. Results of advanced batter technology evaluations for electric vehicle applications

    SciTech Connect

    DeLuca, W.H.; Gillie, K.R.; Kulaga, J.E.; Smaga, J.A.; Tummillo, A.F.; Webster, C.E.

    1992-01-01

    Advanced battery technology evaluations are performed under simulated electric-vehicle operating conditions at the Analysis Diagnostic Laboratory (ADL) of Argonne National Laboratory. The ADL results provide insight Into those factors that limit battery performance and life. The ADL facilities include a test laboratory to conduct battery experimental evaluations under simulated application conditions and a post-test analysis laboratory to determine, In a protected atmosphere if needed, component compositional changes and failure mechanisms. This paper summarizes the performance characterizations and life evaluations conducted during 1991--1992 on both single cells and multi-cell modules that encompass eight battery technologies (Na/S, Li/MS (M=metal), Ni/MH, Ni/Cd, Ni/Zn, Ni/Fe, Zn/Br, and Pb-acid). These evaluations were performed for the Department of Energy, Office of Transportation Technologies, Electric and Hybrid Propulsion Division, and the Electric Power Research Institute. The ADL provides a common basis for battery performance characterization and life evaluations with unbiased application of tests and analyses. The results help identify the most-promising R D approaches for overcoming battery limitations, and provide battery users, developers, and program managers with a measure of the progress being made in battery R D programs, a comparison of battery technologies, and basic data for modeling.

  9. 3D resolution gray-tone lithography

    NASA Astrophysics Data System (ADS)

    Dumbravescu, Niculae

    2000-04-01

    With the conventional micro machining technologies: isotropic and anisotropic, dry and wet etching, a few shapes can be done. To overcome this limitation, both binary multi- tasking technique or direct EB writing were used, but an inexpensive one-step UV-lithographic method, using a so- called 'gray-tone reticle', seems to be the best choice to produce local intensity modulation during exposure process. Although, by using this method and common technologies in standard IC fabrication it is easy to obtain an arbitrarily 3D shaping of positive thick resists, there are some limitations, too. The maximum number of gray-levels, on projection reticle, achieved by e-beam writing, are only 200. Also, for very thick resists, the limited focus depth of the projection objective gives a poor lateral resolution. These are the reasons why the author prose da new approach to enhance the 3D resolution of gray-tone lithography applied for thick resist. By a high resolution, both for vertical direction, as well as for horizontal direction. Particular emphasis was put on the design, manufacturing and use of halftone transmission masks, required for UV- lithographic step in the fabrication process of mechanical, optical or electronics components. The original design and fabrication method for the gray-tone test reticle were supported by experiments showing the main advantage of this new technology: the 3D structuring of thick resist in a single exposure step and also a very promising aspect ratio obtained of over 9:1. Preliminary experimental results are presented for positive thick resists in SEM micrographs. A future optimization of the lithographic process opens interesting perspectives for application of this high 3D resolution structuring method in the fabrication process of different products, with imposed complex smooth profiles, such as: x-ray LiGA-masks, refractive optics and surface- relief DOEs.

  10. Double-Sided Opportunities Using Chemical Lift-Off Lithography.

    PubMed

    Andrews, Anne M; Liao, Wei-Ssu; Weiss, Paul S

    2016-08-16

    We discuss the origins, motivation, invention, development, applications, and future of chemical lift-off lithography, in which a specified pattern of a self-assembled monolayer is removed, i.e., lifted off, using a reactive, patterned stamp that is brought into contact with the monolayer. For Au substrates, this process produces a supported, patterned monolayer of Au on the stamp in addition to the negative pattern in the original molecular monolayer. Both the patterned molecular monolayer on the original substrate and the patterned supported metal monolayer on the stamp are useful as materials and for further applications in sensing and other areas. Chemical lift-off lithography effectively lowers the barriers to and costs of high-resolution, large-area nanopatterning. On the patterned monolayer side, features in the single-nanometer range can be produced across large (square millimeter or larger) areas. Patterns smaller than the original stamp feature sizes can be produced by controlling the degree of contact between the stamp and the lifted-off monolayer. We note that this process is different than conventional lift-off processes in lithography in that chemical lift-off lithography removes material, whereas conventional lift-off is a positive-tone patterning method. Chemical lift-off lithography is in some ways similar to microtransfer printing. Chemical lift-off lithography has critical advantages in the preparation of biocapture surfaces because the molecules left behind are exploited to space and to orient functional(ized) molecules. On the supported metal monolayer side, a new two-dimensional material has been produced. The useful important chemical properties of Au (vis-à-vis functionalization with thiols) are retained, but the electronic and optical properties of bulk Au or even Au nanoparticles are not. These metal monolayers do not quench excitation and may be useful in optical measurements, particularly in combination with selective binding due to

  11. Recent advances in hydrogen peroxide imaging for biological applications.

    PubMed

    Guo, Hengchang; Aleyasin, Hossein; Dickinson, Bryan C; Haskew-Layton, Renée E; Ratan, Rajiv R

    2014-01-01

    Mounting evidence supports the role of hydrogen peroxide (H2O2) in physiological signaling as well as pathological conditions. However, the subtleties of peroxide-mediated signaling are not well understood, in part because the generation, degradation, and diffusion of H2O2 are highly volatile within different cellular compartments. Therefore, the direct measurement of H2O2 in living specimens is critically important. Fluorescent probes that can detect small changes in H2O2 levels within relevant cellular compartments are important tools to study the spatial dynamics of H2O2. To achieve temporal resolution, the probes must also be photostable enough to allow multiple readings over time without loss of signal. Traditional fluorescent redox sensitive probes that have been commonly used for the detection of H2O2 tend to react with a wide variety of reactive oxygen species (ROS) and often suffer from photostablilty issues. Recently, new classes of H2O2 probes have been designed to detect H2O2 with high selectivity. Advances in H2O2 measurement have enabled biomedical scientists to study H2O2 biology at a level of precision previously unachievable. In addition, new imaging techniques such as two-photon microscopy (TPM) have been employed for H2O2 detection, which permit real-time measurements of H2O2 in vivo. This review focuses on recent advances in H2O2 probe development and optical imaging technologies that have been developed for biomedical applications.

  12. Applications and advances of positron beam spectroscopy: appendix a

    SciTech Connect

    Howell, R. H., LLNL

    1997-11-05

    Over 50 scientists from DOE-DP, DOE-ER, the national laboratories, academia and industry attended a workshop held on November 5-7, 1997 at Lawrence Livermore National Laboratory jointly sponsored by the DOE-Division of Materials Science, The Materials Research Institute at LLNL and the University of California Presidents Office. Workshop participants were charged to address two questions: Is there a need for a national center for materials analysis using positron techniques and can the capabilities at Lawrence Livermore National Laboratory serve this need. To demonstrate the need for a national center the workshop participants discussed the technical advantages enabled by high positron currents and advanced measurement techniques, the role that these techniques will play in materials analysis and the demand for the data. There were general discussions lead by review talks on positron analysis techniques, and their applications to problems in semiconductors, polymers and composites, metals and engineering materials, surface analysis and advanced techniques. These were followed by focus sessions on positron analysis opportunities in these same areas. Livermore now leads the world in materials analysis capabilities by positrons due to developments in response to demands of science based stockpile stewardship. There was a detailed discussion of the LLNL capabilities and a tour of the facilities. The Livermore facilities now include the worlds highest current beam of keV positrons, a scanning pulsed positron microprobe under development capable of three dimensional maps of defect size and concentration, an MeV positron beam for defect analysis of large samples, and electron momentum spectroscopy by positrons. This document is a supplement to the written summary report. It contains a complete schedule, list of attendees and the vuegraphs for the presentations in the review and focus sessions.

  13. Advanced Health Management Algorithms for Crew Exploration Applications

    NASA Technical Reports Server (NTRS)

    Davidson, Matt; Stephens, John; Jones, Judit

    2005-01-01

    Achieving the goals of the President's Vision for Exploration will require new and innovative ways to achieve reliability increases of key systems and sub-systems. The most prominent approach used in current systems is to maintain hardware redundancy. This imposes constraints to the system and utilizes weight that could be used for payload for extended lunar, Martian, or other deep space missions. A technique to improve reliability while reducing the system weight and constraints is through the use of an Advanced Health Management System (AHMS). This system contains diagnostic algorithms and decision logic to mitigate or minimize the impact of system anomalies on propulsion system performance throughout the powered flight regime. The purposes of the AHMS are to increase the probability of successfully placing the vehicle into the intended orbit (Earth, Lunar, or Martian escape trajectory), increase the probability of being able to safely execute an abort after it has developed anomalous performance during launch or ascent phases of the mission, and to minimize or mitigate anomalies during the cruise portion of the mission. This is accomplished by improving the knowledge of the state of the propulsion system operation at any given turbomachinery vibration protection logic and an overall system analysis algorithm that utilizes an underlying physical model and a wide array of engine system operational parameters to detect and mitigate predefined engine anomalies. These algorithms are generic enough to be utilized on any propulsion system yet can be easily tailored to each application by changing input data and engine specific parameters. The key to the advancement of such a system is the verification of the algorithms. These algorithms will be validated through the use of a database of nominal and anomalous performance from a large propulsion system where data exists for catastrophic and noncatastrophic propulsion sytem failures.

  14. Investigation of Glass Polycapillaries for Use in Proximity X-Ray Lithography.

    NASA Astrophysics Data System (ADS)

    Klotzko, Ira L.

    developers claim that as line widths in circuits are reduced to 0.18 mum, x-ray optics, specifically a collimator, will be needed to produce the required beam characteristics^6. Among a number of designs, arrays of glass polycapillary fibers have the potential of controlling parameters important to point -source lithography. The high absorption of x-rays by air at energies less than 3 keV necessitates the development of such a collimator be done in an atmosphere such as helium or vacuum. Consequently, there has been little research done at energies of 3 keV or lower. An experimental setup that tests glass capillary fibers under such conditions has been developed. It has sufficiently long optical paths in the vacuum chamber to be useful in evaluating the parameters critical for semiconductor lithography. Experimental and simulated transmission characteristics of polycapillary fibers have been studied at 1 keV.^7 Using this data, a collimator has been developed which will help determine the feasibility of using polycapillary optics for point-source-x-ray lithography. ftn ^1Semiconductor Industry Association, The National Technology Roadmap for Semiconductors, p.87 (1994). ^2Semiconductor International, Feb. (1996). ^3H. Loschner, Proc. SPIE 2194, p. 384 (1994). ^4R. Bojko, Proc. SPIE 1924, p. 214 (1993). ^5L. Liebmann, Proc. SPIE 2194, p. 51 (1994). ^6J. Abate, Advanced Lithography Program, Point Source Collimation Workshop II, Scottsdale AZ (1995). ^7I. Klotzko, Proc. SPIE 2523, p. 174 (1994).

  15. Design of the ultraprecision stage for lithography using VCM

    NASA Astrophysics Data System (ADS)

    Kim, Jung-Han; Kim, Mun-Su; Oh, Min-Taek

    2007-12-01

    This paper presents a new design of precision stage for the reticle in lithography process and a low hunting control method for the stage. The stage has three axes for X,Y, θ Z, those actuated by three voice coil motors individually. The proposed precision stage system has three gap sensors and voice coil motors, and supported by four air bearings, so it do not have any mechanical contact and nonlinear effect such as hysterisis which usually degrade performance in nano level movement. The reticle stage has cross coupled dynamics between X,Y,θ Z, axes, so the forward and inverse kinematics were solved to get an accurate reference position. When the stage is in regulating control mode, there always exist small fluctuations (stage hunting) in the stage movement. Because the low stage hunting characteristic is very important in recent lithography and nano-level applications, the proposed stage has a special regulating controller composed of digital filter, adjustor and switching algorithm. Another importance factor that generates hunting noise is the system noise inside the lithography machine such as EMI from another motor and solenoids. For reducing such system noises, the proposed controller has a two-port transmission system that transfers torque command signal from the DSP board to the amplifier. The low hunting control algorithm and two-port transmission system reduced hunting noise as 35nm(rms) when a conventional PID generates 77nm(rms) in the same mechanical system. The experimental results showed that the reticle system has 100nm linear accuracy and 1μ rad rotation accuracy at the control frequency of 8 kHz.

  16. Sources for beyond extreme ultraviolet lithography and water window imaging

    NASA Astrophysics Data System (ADS)

    O'Sullivan, Gerry; Li, Bowen; Dunne, Padraig; Hayden, Paddy; Kilbane, Deirdre; Lokasani, Ragava; Long, Elaine; Ohashi, Hayato; O'Reilly, Fergal; Sheil, John; Sheridan, Paul; Sokell, Emma; Suzuki, Chihiro; White, Elgiva; Higashiguchi, Takeshi

    2015-05-01

    Lithography tools are being built and shipped to semiconductor manufacturers for high volume manufacturing using extreme ultraviolet lithography (EUVL) at a wavelength of 13.5 nm. This wavelength is based on the availability of Mo/Si multilayer mirrors (MLMs) with a reflectivity of ˜70% at this wavelength. Moreover, the primary lithography tool manufacturer, ASML, has identified 6.x nm, where x˜7, as the wavelength of choice for so-called Beyond EUVL, based on the availability of La/B4C MLMs, with theoretical reflectance approaching 80% at this wavelength. The optimum sources have been identified as laser produced plasmas of Gd and Tb, as n = 4-n = 4 transitions in their ions emit strongly near this wavelength. However, to date, the highest conversion efficiency obtained, for laser to EUV energy emitted within the 0.6% wavelength bandwidth of the mirror is only 0.8%, pointing to the need to identify other potential sources or consider the selection of other wavelengths. At the same time, sources for other applications are being developed. Conventional sources for soft x-ray microscopy use H-like line emission from liquid nitrogen or carbon containing liquid jets which can be focused using zone plates. Recently the possibility of using MLMs with n = 4-n = 4 emission from a highly charged Bi plasma was proposed and subsequently the possibility of using Δn = 1 transitions in 3rd row transition elements was identified. All of these studies seek to identify spectral features that coincide with the reflectance characteristics of available MLMs, determine the conditions under which they are optimized and establish the maximum conversion efficiencies obtainable. Thus, there is a need for systematic studies of laser produced plasmas of a wide range of elements as some of the challenges are similar for all of these sources and some recent results will be presented.

  17. Integration of plant viruses in electron beam lithography nanostructures

    NASA Astrophysics Data System (ADS)

    Alonso, Jose M.; Ondarçuhu, Thierry; Bittner, Alexander M.

    2013-03-01

    Tobacco mosaic virus (TMV) is the textbook example of a virus, and also of a self-assembling nanoscale structure. This tubular RNA/protein architecture has also found applications as biotemplate for the synthesis of nanomaterials such as wires, as tubes, or as nanoparticle assemblies. Although TMV is, being a biological structure, quite resilient to environmental conditions (temperature, chemicals), it cannot be processed in electron beam lithography (eBL) fabrication, which is the most important and most versatile method of nanoscale structuring. Here we present adjusted eBL-compatible processes that allow the incorporation of TMV in nanostructures made of positive and negative tone eBL resists. The key steps are covering TMV by polymer resists, which are only heated to 50 °C, and development (selective dissolution) in carefully selected organic solvents. We demonstrate the post-lithography biochemical functionality of TMV by selective immunocoating of the viral particles, and the use of immobilized TMV as direct immunosensor. Our modified eBL process should be applicable to incorporate a wide range of sensitive materials in nanofabrication schemes.

  18. Integration of plant viruses in electron beam lithography nanostructures.

    PubMed

    Alonso, Jose M; Ondarçuhu, Thierry; Bittner, Alexander M

    2013-03-15

    Tobacco mosaic virus (TMV) is the textbook example of a virus, and also of a self-assembling nanoscale structure. This tubular RNA/protein architecture has also found applications as biotemplate for the synthesis of nanomaterials such as wires, as tubes, or as nanoparticle assemblies. Although TMV is, being a biological structure, quite resilient to environmental conditions (temperature, chemicals), it cannot be processed in electron beam lithography (eBL) fabrication, which is the most important and most versatile method of nanoscale structuring. Here we present adjusted eBL-compatible processes that allow the incorporation of TMV in nanostructures made of positive and negative tone eBL resists. The key steps are covering TMV by polymer resists, which are only heated to 50 °C, and development (selective dissolution) in carefully selected organic solvents. We demonstrate the post-lithography biochemical functionality of TMV by selective immunocoating of the viral particles, and the use of immobilized TMV as direct immunosensor. Our modified eBL process should be applicable to incorporate a wide range of sensitive materials in nanofabrication schemes.

  19. Large area patterning using interference and nanoimprint lithography

    NASA Astrophysics Data System (ADS)

    Bläsi, B.; Tucher, N.; Höhn, O.; Kübler, V.; Kroyer, T.; Wellens, Ch.; Hauser, H.

    2016-04-01

    Interference lithography (IL) is the best suited technology for the origination of large area master structures with high resolution. In prior works, we seamlessly pattern areas of up to 1.2 x 1.2 m2 with periodic features, i.e. a diffraction grating with a period in the micron range. For this process we use an argon ion laser emitting at 363.8 nm. Thus, feasible periods are in the range of 100 μm to 200 nm. Edge-defined techniques or also called (self-aligned) double patterning processes can be used to double the spatial frequency of such structures. This way, we aim to reduce achievable periods further down to 100 nm. In order to replicate master structures, we make use of nanoimprint lithography (NIL) processes. In this work, we present results using IL as mastering and NIL as replication technology in the fields of photovoltaics as well as display and lighting applications. In photovoltaics different concepts like the micron-scale patterning of the front side as well as the realization of rear side diffraction gratings are presented. The benefit for each is shown on final device level. In the context of display and lighting applications, we realized various structures ranging from designed, symmetric or asymmetric, diffusers, antireflective and/or antiglare structures, polarization optical elements (wire grid polarizers), light guidance and light outcoupling structures.

  20. Interference Lithography for Optical Devices and Coatings

    DTIC Science & Technology

    2010-01-01

    fabricate self- healing coatings that use water from the environment to catalyze polymerization. Polymerization induced phase separation was used to... catalyzed by moisture in air; if the indices of the two polymers are matched, the coatings turn transparent after healing. Interference lithography...self- healing coatings that use water from the environment to catalyze polymerization. Polymerization induced phase separation was used to sequester

  1. Liquid-Phase Beam Pen Lithography.

    PubMed

    He, Shu; Xie, Zhuang; Park, Daniel J; Liao, Xing; Brown, Keith A; Chen, Peng-Cheng; Zhou, Yu; Schatz, George C; Mirkin, Chad A

    2016-02-24

    Beam pen lithography (BPL) in the liquid phase is evaluated. The effect of tip-substrate gap and aperture size on patterning performance is systematically investigated. As a proof-of-concept experiment, nanoarrays of nucleotides are synthesized using BPL in an organic medium, pointing toward the potential of using liquid phase BPL to perform localized photochemical reactions that require a liquid medium.

  2. High speed e-beam lithography for gold nanoarray fabrication and use in nanotechnology

    PubMed Central

    François, Marc; Romijn, Hans; Codron, Jean-Louis; Vuillaume, Dominique; Théron, Didier; Clément, Nicolas

    2014-01-01

    Summary E-beam lithography has been used for reliable and versatile fabrication of sub-15 nm single-crystal gold nanoarrays and led to convincing applications in nanotechnology. However, so far this technique was either too slow for centimeter to wafer-scale writing or fast enough with the so-called dot on the fly (DOTF) technique but not optimized for sub-15 nm dots dimension. This prevents use of this technology for some applications and characterization techniques. Here, we show that the DOTF technique can be used without degradation in dots dimension. In addition, we propose two other techniques. The first one is an advanced conventional technique that goes five times faster than the conventional one. The second one relies on sequences defined before writing which enable versatility in e-beam patterns compared to the DOTF technique with same writing speed. By comparing the four different techniques, we evidence the limiting parameters for the writing speed. Wafer-scale fabrication of such arrays with 50 nm pitch allowed XPS analysis of a ferrocenylalkyl thiol self-assembled monolayer coated gold nanoarray. PMID:25383303

  3. Study of the application of advanced technologies to long range transport aircraft. Volume 2: Advanced technology program recommendations

    NASA Technical Reports Server (NTRS)

    1972-01-01

    The benefits of the application of advanced technology to future transport aircraft were investigated. The noise reduction goals established by the CARD (Civil Aviation Research and Development) study for the 1981-1985 time period can be satisfied. Reduced terminal area and airway congestion can result from use of advanced on-board systems and operating procedures. The use of advanced structural design concepts can result in greatly reduced gross weight and improved operating economics. The full potential of these benefits can be realized in a 1985 airplane by implementing a research and development program that is funded to an average level of approximately $55 million per year over a ten year period.

  4. 76 FR 74067 - Medicare Program; Announcement of a New Application Deadline for the Advance Payment Model

    Federal Register 2010, 2011, 2012, 2013, 2014

    2011-11-30

    ... Advance Payment Model for certain accountable care organizations participating in the Medicare Shared..., coordinated care and generate cost savings. The Advance Payment Model will test whether and how pre-paying a... Application Deadline for the Advance Payment Model AGENCY: Centers for Medicare & Medicaid Services (CMS),...

  5. Capillary Force Lithography for Cardiac Tissue Engineering

    PubMed Central

    Macadangdang, Jesse; Lee, Hyun Jung; Carson, Daniel; Jiao, Alex; Fugate, James; Pabon, Lil; Regnier, Michael; Murry, Charles; Kim, Deok-Ho

    2014-01-01

    Cardiovascular disease remains the leading cause of death worldwide1. Cardiac tissue engineering holds much promise to deliver groundbreaking medical discoveries with the aims of developing functional tissues for cardiac regeneration as well as in vitro screening assays. However, the ability to create high-fidelity models of heart tissue has proven difficult. The heart’s extracellular matrix (ECM) is a complex structure consisting of both biochemical and biomechanical signals ranging from the micro- to the nanometer scale2. Local mechanical loading conditions and cell-ECM interactions have recently been recognized as vital components in cardiac tissue engineering3-5. A large portion of the cardiac ECM is composed of aligned collagen fibers with nano-scale diameters that significantly influences tissue architecture and electromechanical coupling2. Unfortunately, few methods have been able to mimic the organization of ECM fibers down to the nanometer scale. Recent advancements in nanofabrication techniques, however, have enabled the design and fabrication of scalable scaffolds that mimic the in vivo structural and substrate stiffness cues of the ECM in the heart6-9. Here we present the development of two reproducible, cost-effective, and scalable nanopatterning processes for the functional alignment of cardiac cells using the biocompatible polymer poly(lactide-co-glycolide) (PLGA)8 and a polyurethane (PU) based polymer. These anisotropically nanofabricated substrata (ANFS) mimic the underlying ECM of well-organized, aligned tissues and can be used to investigate the role of nanotopography on cell morphology and function10-14. Using a nanopatterned (NP) silicon master as a template, a polyurethane acrylate (PUA) mold is fabricated. This PUA mold is then used to pattern the PU or PLGA hydrogel via UV-assisted or solvent-mediated capillary force lithography (CFL), respectively15,16. Briefly, PU or PLGA pre-polymer is drop dispensed onto a glass coverslip and the PUA

  6. Managing Linguistic Data Summaries in Advanced P2P Applications

    NASA Astrophysics Data System (ADS)

    Hayek, Rabab; Raschia, Guillaume; Valduriez, Patrick; Mouaddib, Noureddine

    As the amount of stored data increases, data localization techniques become no longer sufficient in P2P systems. A practical approach is to rely on compact database summaries rather than raw database records, whose access is costly in large P2P systems. In this chapter, we describe a solution for managing linguistic data summaries in advanced P2P applications which are dealing with semantically rich data. The produced summaries are synthetic, multidimensional views over relational tables. The novelty of this proposal relies on the double summary exploitation in distributed P2P systems. First, as semantic indexes, they support locating relevant nodes based on their data descriptions. Second, due to their intelligibility, these summaries can be directly queried and thus approximately answer a query without the need for exploring original data. The proposed solution consists first in defining a summary model for hierarchical P2P systems. Second, appropriate algorithms for summary creation and maintenance are presented. A query processing mechanism, which relies on summary querying, is then proposed to demonstrate the benefits that might be obtained from summary exploitation.

  7. Advanced polymer systems for optoelectronic integrated circuit applications

    NASA Astrophysics Data System (ADS)

    Eldada, Louay A.; Stengel, Kelly M. T.; Shacklette, Lawrence W.; Norwood, Robert A.; Xu, Chengzeng; Wu, Chengjiu; Yardley, James T.

    1997-01-01

    An advanced versatile low-cost polymeric waveguide technology is proposed for optoelectronic integrated circuit applications. We have developed high-performance organic polymeric materials that can be readily made into both multimode and single-mode optical waveguide structures of controlled numerical aperture (NA) and geometry. These materials are formed from highly crosslinked acrylate monomers with specific linkages that determine properties such as flexibility, toughness, loss, and stability against yellowing and humidity. These monomers are intermiscible, providing for precise adjustment of the refractive index from 1.30 to 1.60. Waveguides are formed photolithographically, with the liquid monomer mixture polymerizing upon illumination in the UV via either mask exposure or laser direct-writing. A wide range of rigid and flexible substrates can be used, including glass, quartz, oxidized silicon, glass-filled epoxy printed circuit board substrate, and flexible polyimide film. We discuss the use of these materials on chips and on multi-chip modules (MCMs), specifically in transceivers where we adaptively produced waveguides on vertical-cavity surface-emitting lasers (VCSELs) embedded in transmitter MCMs and on high- speed photodetector chips in receiver MCMs. Light coupling from and to chips is achieved by cutting 45 degree mirrors using excimer laser ablation. The fabrication of our polymeric structures directly on the modules provides for stability, ruggedness, and hermeticity in packaging.

  8. Advanced Turbine Technology Applications Project (ATTAP) 1993 annual report

    NASA Technical Reports Server (NTRS)

    1994-01-01

    This report summarizes work performed by AlliedSignal Engines, a unit of AlliedSignal Aerospace Company, during calendar year 1993, toward development and demonstration of structural ceramic technology for automotive gas turbine engines. This work was performed for the U.S. Department of Energy (DOE) under National Aeronautics and Space Administration (NASA) Contract DEN3-335, Advanced Turbine Technology Applications Project (ATFAP). During 1993, the test bed used to demonstrate ceramic technology was changed from the AlliedSignal Engines/Garrett Model AGT101 regenerated gas turbine engine to the Model 331-200(CT) engine. The 331-200(CT) ceramic demonstrator is a fully-developed test platform based on the existing production AlliedSignal 331-200(ER) gas turbine auxiliary power unit (APU), and is well suited to evaluating ceramic turbine blades and nozzles. In addition, commonality of the 331-200(CT) engine with existing gas turbine APU's in commercial service provides the potential for field testing of ceramic components. The 1993 ATTAP activities emphasized design modifications of the 331-200 engine test bed to accommodate ceramic first-stage turbine nozzles and blades, fabrication of the ceramic components, ceramic component proof and rig tests, operational tests of the test bed equipped with the ceramic components, and refinement of critical ceramic design technologies.

  9. Advanced Imaging and Robotics Technologies for Medical Applications

    NASA Astrophysics Data System (ADS)

    Masamune, Ken; Hong, Jaesung

    2011-10-01

    Due to the importance of surgery in the medical field, a large amount of research has been conducted in this area. Imaging and robotics technologies provide surgeons with the advanced eye and hand to perform their surgeries in a safer and more accurate manner. Recently medical images have been utilized in the operating room as well as in the diagnostic stage. If the image to patient registration is done with sufficient accuracy, medical images can be used as "a map" for guidance to the target lesion. However, the accuracy and reliability of the surgical navigation system should be sufficiently verified before applying it to the patient. Along with the development of medical imaging, various medical robots have also been developed. In particular, surgical robots have been researched in order to reach the goal of minimal invasiveness. The most important factors to consider are determining the demand, the strategy for their use in operating procedures, and how it aids patients. In addition to the above considerations, medical doctors and researchers should always think from the patient's point of view. In this article, the latest medical imaging and robotic technologies focusing on surgical applications are reviewed based upon the factors described in the above.

  10. Advances in the application of diffusion Monte Carlo to solids

    NASA Astrophysics Data System (ADS)

    Shulenburger, L.; Mattsson, T. R.

    2014-03-01

    The need for high fidelity electronic structure calculations has catalyzed an explosion in the development of new techniques. Improvements in DFT functionals, many body perturbation theory and dynamical mean field theory are starting to make significant headway towards reaching the accuracy required for a true predictive capability. One technique that is undergoing a resurgence is diffusion Monte Carlo (DMC). The early calculations with this method were of unquestionable accuracy (providing a valuable reference for DFT functionals) but were largely limited to model systems because of their high computational cost. Algorithmic advances and improvements in computer power have reached the point where this is no longer an insurmountable obstacle. In this talk I will present a broad study of DMC applied to condensed matter (arXiv:1310.1047). We have shown excellent agreement for the bulk modulus and lattice constant of solids exhibiting several different types of binding, including ionic, covalent and van der Waals. We will discuss both the opportunities for application of this method as well as opportunities for further theoretical improvements. Sandia National Laboratories is a multiprogram laboratory managed and operated by Sandia Corporation, a wholly owned subsidiary of Lockheed Martin Corporation, for the U.S. Department of Energy's NNSA under Contract No. DE-AC04-94AL85000.

  11. Advances in laser-based isotope ratio measurements: selected applications

    NASA Astrophysics Data System (ADS)

    Kerstel, E.; Gianfrani, L.

    2008-09-01

    Small molecules exhibit characteristic ro-vibrational transitions in the near- and mid-infrared spectral regions, which are strongly influenced by isotopic substitution. This gift of nature has made it possible to use laser spectroscopy for the accurate analysis of the isotopic composition of gaseous samples. Nowadays, laser spectroscopy is clearly recognized as a valid alternative to isotope ratio mass spectrometry. Laser-based instruments are leaving the research laboratory stage and are being used by a growing number of isotope researchers for significant advances in their own field of research. In this review article, we discuss the current status and new frontiers of research on high-sensitivity and high-precision laser spectroscopy for isotope ratio analyses. Although many of our comments will be generally applicable to laser isotope ratio analyses in molecules of environmental importance, this paper concerns itself primarily with water and carbon dioxide, two molecules that were studied extensively in our respective laboratories. A complete coverage of the field is practically not feasible in the space constraints of this issue, and in any case doomed to fail, considering the large body of work that has appeared ever since the review by Kerstel in 2004 ( Handbook of Stable Isotope Analytical Techniques, Chapt. 34, pp. 759-787).

  12. Engineering derivatives from biological systems for advanced aerospace applications

    NASA Technical Reports Server (NTRS)

    Winfield, Daniel L.; Hering, Dean H.; Cole, David

    1991-01-01

    The present study consisted of a literature survey, a survey of researchers, and a workshop on bionics. These tasks produced an extensive annotated bibliography of bionics research (282 citations), a directory of bionics researchers, and a workshop report on specific bionics research topics applicable to space technology. These deliverables are included as Appendix A, Appendix B, and Section 5.0, respectively. To provide organization to this highly interdisciplinary field and to serve as a guide for interested researchers, we have also prepared a taxonomy or classification of the various subelements of natural engineering systems. Finally, we have synthesized the results of the various components of this study into a discussion of the most promising opportunities for accelerated research, seeking solutions which apply engineering principles from natural systems to advanced aerospace problems. A discussion of opportunities within the areas of materials, structures, sensors, information processing, robotics, autonomous systems, life support systems, and aeronautics is given. Following the conclusions are six discipline summaries that highlight the potential benefits of research in these areas for NASA's space technology programs.

  13. Advances in functional magnetic resonance imaging: technology and clinical applications.

    PubMed

    Dickerson, Bradford C

    2007-07-01

    Functional MRI (fMRI) is a valuable method for use by clinical investigators to study task-related brain activation in patients with neurological or neuropsychiatric illness. Despite the relative infancy of the field, the rapid adoption of this functional neuroimaging technology has resulted from, among other factors, its ready availability, its relatively high spatial and temporal resolution, and its safety as a noninvasive imaging tool that enables multiple repeated scans over the course of a longitudinal study, and thus may lend itself well as a measure in clinical drug trials. Investigators have used fMRI to identify abnormal functional brain activity during task performance in a variety of patient populations, including those with neurodegenerative, demyelinating, cerebrovascular, and other neurological disorders that highlight the potential utility of fMRI in both basic and clinical spheres of research. In addition, fMRI studies reveal processes related to neuroplasticity, including compensatory hyperactivation, which may be a universally-occurring, adaptive neural response to insult. Functional MRI is being used to study the modulatory effects of genetic risk factors for neurological disease on brain activation; it is being applied to differential diagnosis, as a predictive biomarker of disease course, and as a means to identify neural correlates of neurotherapeutic interventions. Technological advances are rapidly occurring that should provide new applications for fMRI, including improved spatial resolution, which promises to reveal novel insights into the function of fine-scale neural circuitry of the human brain in health and disease.

  14. Ground-to-orbit laser propulsion: Advanced applications

    SciTech Connect

    Kare, J.T.

    1990-01-01

    Laser propulsion uses a large fixed laser to supply energy to heat an inert propellant in a rocket thruster. Such a system has two potential advantages: extreme simplicity of the thruster, and potentially high performance -- particularly high exhaust velocity. By taking advantage of the simplicity of the thruster, it should be possible to launch small (10--1000 kg) payloads to orbit using roughly 1 MW of average laser power per kg of payload. The incremental cost of such launches would be of order $200/kg for the smallest systems, decreasing to essentially the cost of electricity to run the laser (a few times $10/kg) for large systems. Although the individual payload size would be small, a laser launch system would be inherently high-volume, with the capacity to launch tens of thousands of payloads per year. Also, with high exhaust velocity, a laser launch system could launch payloads to high velocities -- geosynchronous transfer, Earth escape, or beyond -- at a relatively small premium over launches to LEO. In this paper, we briefly review the status of pulsed laser propulsion, including proposals for advanced vehicles. We then discuss qualitatively several unique applications appropriate to the early part of the next century, and perhaps valuable well into the next millenium: space habitat supply, deep space mission supply, nuclear waste disposal, and manned vehicle launching.

  15. Ground-to-orbit laser propulsion: Advanced applications

    NASA Technical Reports Server (NTRS)

    Kare, Jordin T.

    1990-01-01

    Laser propulsion uses a large fixed laser to supply energy to heat an inert propellant in a rocket thruster. Such a system has two potential advantages: extreme simplicity of the thruster, and potentially high performance, particularly high exhaust velocity. By taking advantage of the simplicity of the thruster, it should be possible to launch small (10 to 1000 kg) payloads to orbit using roughly 1 MW of average laser power per kg of payload. The incremental cost of such launches would be of an order of $200/kg for the smallest systems, decreasing to essentially the cost of electricity to run the laser (a few times $10/kg) for larger systems. Although the individual payload size would be smaller, a laser launch system would be inherently high-volume, with the capacity to launch tens of thousands of payloads per year. Also, with high exhaust velocity, a laser launch system could launch payloads to high velocities - geosynchronous transfer, Earth escape, or beyond - at a relatively small premium over launches to LEO. The status of pulsed laser propulsion is briefly reviewed including proposals for advanced vehicles. Several applications appropriate to the early part of the next century and perhaps valuable well into the next millennium are discussed qualitatively: space habitat supply, deep space mission supply, nuclear waste disposal, and manned vehicle launching.

  16. Diffusion Tensor Imaging and Its Application to Traumatic Brain Injury: Basic Principles and Recent Advances

    DTIC Science & Technology

    2012-12-01

    Diffusion Tensor Imaging and Its Application to Traumatic Brain Injury: Basic Principles and Recent Advances Ping-Hong Yeh1*, Terrence R. Oakes2,3...00-2012 4. TITLE AND SUBTITLE Diffusion Tensor Imaging and Its Application to Traumatic Brain Injury: Basic Principles and Recent Advances 5a...Gerard Riedy1,2,3,4 1Traumatic Brain Injury Image Analysis Lab, Henry Jackson Foundation for the Advancement of Military Medicine, Rockville, USA

  17. Nanoimprint lithography for functional polymer patterning

    NASA Astrophysics Data System (ADS)

    Cui, Dehu

    2011-07-01

    Organic semiconductors have generated huge interested in recent years for low-cost and flexible electronics. Current and future device applications for semiconducting polymers include light-emitting diodes, thin-film transistors, photovoltaic cells, photodetectors, lasers, and memories. The performance of conjugated polymer devices depends on two major factors: the chain conformation in polymer film and the device architecture. Highly ordered chain structure usually leads to much improved performance by enhancing interchain interaction to facilitate carrier transport. The goal of this research is to improve the performance of organic devices with the nanoimprint lithography. The work begins with the controlling of polymer chain orientation in patterned nanostructures through nanoimprint mold design and process parameter manipulation, and studying the effect of chain ordering on material properties. Then, step-and-repeat thermal nanoimprint technique for large-scale continuous manufacturing of conjugated polymer nanostructures is developed. After that, Systematic investigation of polymer chain configuration by Raman spectroscopy is carried out to understand how nanoimprint process parameters, such as mold pattern size, temperature, and polymer molecular weight, affects polymer chain configuration. The results indicate that chain orientation in nanoimprinted polymer micro- and nanostructures is highly related to the nanoimprint temperature and the dimensions of the mold structures. The ability to create nanoscale polymer micro- and nanostructures and manipulate their internal chain conformation establishes an original experimental platform that enables studying the properties of functional polymers at the micro- and nanoscale and understanding their fundamental structure-property relationships. In addition to the impact on basic research, the techniques developed in this work are important in applied research and development. Large-area conjugated polymer micro- and

  18. Recent Advances in Seismic Wavefront Tracking Techniques and Their Applications

    NASA Astrophysics Data System (ADS)

    Sambridge, M.; Rawlinson, N.; Hauser, J.

    2007-12-01

    In observational seismology, wavefront tracking techniques are becoming increasingly popular as a means of predicting two point traveltimes and their associated paths. Possible applications include reflection migration, earthquake relocation and seismic tomography at a wide variety of scales. Compared with traditional ray based techniques such as shooting and bending, wavefront tracking has the advantage of locating traveltimes between the source and every point in the medium; in many cases, improved efficiency and robustness; and greater potential for tracking multiple arrivals. In this presentation, two wavefront tracking techniques will be considered: the so-called Fast Marching Method (FMM), and a wavefront construction (WFC) scheme. Over the last several years, FMM has become a mature technique in seismology, with a number of improvements to the underlying theory and the release of software tools that allow it to be used in a variety of applications. At its core, FMM is a grid based solver that implicitly tracks a propagating wavefront by seeking finite difference solutions to the eikonal equation along an evolving narrow band. Recent developments include the use of source grid refinement to improve accuracy, the introduction of a multi-stage scheme to allow reflections and refractions to be tracked in layered media, and extension to spherical coordinates. Implementation of these ideas has led to a number of different applications, including teleseismic tomography, wide-angle reflection and refraction tomography, earthquake relocation, and ambient noise imaging using surface waves. The WFC scheme represents the wavefront surface as a set of points in 6-D phase space; these points are advanced in time using local initial value ray tracing in order to form a sequence of wavefront surfaces that fill the model volume. Surface refinement and simplification techniques inspired by recent developments in computer graphics are used to maintain a fixed density of nodes

  19. Intregrating metallic wiring with three-dimensional polystyrene colloidal crystals using electron-beam lithography and three-dimensional laser lithography

    NASA Astrophysics Data System (ADS)

    Tian, Yaolan; Isotalo, Tero J.; Konttinen, Mikko P.; Li, Jiawei; Heiskanen, Samuli; Geng, Zhuoran; Maasilta, Ilari J.

    2017-02-01

    We demonstrate a method to fabricate narrow, down to a few micron wide metallic leads on top of a three-dimensional (3D) colloidal crystal self-assembled from polystyrene (PS) nanospheres of diameter 260 nm, using electron-beam lithography. This fabrication is not straightforward due to the fact that PS nanospheres cannot usually survive the harsh chemical treatments required in the development and lift-off steps of electron-beam lithography. We solve this problem by increasing the chemical resistance of the PS nanospheres using an additional electron-beam irradiation step, which allows the spheres to retain their shape and their self-assembled structure, even after baking to a temperature of 160 °C, the exposure to the resist developer and the exposure to acetone, all of which are required for the electron-beam lithography step. Moreover, we show that by depositing an aluminum oxide capping layer on top of the colloidal crystal after the e-beam irradiation, the surface is smooth enough so that continuous metal wiring can be deposited by the electron-beam lithography. Finally, we also demonstrate a way to self-assemble PS colloidal crystals into a microscale container, which was fabricated using direct-write 3D laser-lithography. Metallic wiring was also successfully integrated with the combination of a container structure and a PS colloidal crystal. Our goal is to make a device for studies of thermal transport in 3D phononic crystals, but other phononic or photonic crystal applications could also be envisioned.

  20. Advances in endodontics: Potential applications in clinical practice

    PubMed Central

    Kishen, Anil; Peters, Ove A.; Zehnder, Matthias; Diogenes, Anibal R.; Nair, Madhu K.

    2016-01-01

    Contemporary endodontics has seen an unprecedented advance in technology and materials. This article aimed to review some of the challenges and advances in the following sections: (1) endodontic imaging, (2) root canal preparation, (3) root canal disinfection, (4) root canal filling, and (4) regenerative endodontic procedures (REPs). Jointly, these advances are aimed at improving the state of the art and science of root canal treatment. PMID:27217630

  1. Application of advanced electronics to a future spacecraft computer design

    NASA Technical Reports Server (NTRS)

    Carney, P. C.

    1980-01-01

    Advancements in hardware and software technology are summarized with specific emphasis on spacecraft computer capabilities. Available state of the art technology is reviewed and candidate architectures are defined.

  2. Self-assembled dummy patterns for lithography process margin enhancement

    NASA Astrophysics Data System (ADS)

    Moon, James; Nam, Byoung-Sub; Jeong, Joo-Hong; Nam, Byung-Ho; Yim, Dong Gyu

    2007-03-01

    Over the last couple of years, Design For Manufacturability (DFM) has progressed from concept to practice. What we thought then is actually applied to the design step to meet the high demand placed upon very high tech devices we make today. One of the DFM procedures that benefit the lithography process margin is generation of dummy patterns. Dummy pattern generated at design step enables stable yet high lithography process margin for many of the high technology device. But actual generation of the dummy pattern is very complex and risky for many of the layer used for memory devices. Dummy generation for simple pattern layers such as Poly or Isolation layer is not so difficult since pattern composed for these layers are usually 1 dimensional or very simple 2 dimensional patterns. But for interconnection layers that compose of complex 2 dimensional patterns, dummy pattern generation is very risky and requires lots of time and effort to safely place the dummy patterns. In this study, we propose simple self assembled dummy (SAD) generation algorithm to place dummy pattern for the complex 2 dimensional interconnection layers. This algorithm automatically self assembles dummy pattern based on the original design layout, therefore insuring the safety and simplicity of the generated dummy to the original design. Also we will evaluate SAD on interconnection layer using commercial Model Based Verification (MBV) tool to verify its applicability for both litho process margin and DFM perspective.

  3. Mask image position correction for double patterning lithography

    NASA Astrophysics Data System (ADS)

    Saito, Masato; Itoh, Masamitsu; Ikenaga, Osamu; Ishigo, Kazutaka

    2008-05-01

    Application of double patterning technique has been discussed for lithography of HP 3X nm device generation. In this case, overlay budget for lithography becomes so hard that it is difficult to achieve it with only improvement of photomask's position accuracy. One of the factors of overlay error will be induced by distortion of photomask after chucking on the mask stage of exposure tool, because photomasks are bended by the force of vacuum chucking. Recently, mask flatness prediction technique was developed. This technique is simulating the surface shape of mask when it is on the mask stage by using the flatness data of free-standing state blank and the information of mask chucking stage. To use this predicted flatness data, it is possible to predict a pattern position error after exposed and it is possible to correct it on the photomask. A blank supplier developed the flatness data transfer system to mask vender. Every blanks are distinguished individually by 2D barcode mark on blank which including serial number. The flatness data of each blank is linked with this serial number, and mask vender can use this serial number as a key code to mask flatness data. We developed mask image position correction system by using 2D barcode mark linked to predicted flatness data, and position accuracy assurance system for these masks. And with these systems, we made some masks actually.

  4. Research and development on the application of advanced control technologies to advanced nuclear reactor systems: A US national perspective

    SciTech Connect

    White, J.D.; Monson, L.R.; Carrol, D.G.; Dayal, Y.; Argonne National Lab., IL; General Electric Co., San Jose, CA )

    1989-01-01

    Control system designs for nuclear power plants are becoming more advanced through the use of digital technology and automation. This evolution is taking place because of: (1) the limitations in analog based control system performance and maintenance and availability and (2) the promise of significant improvement in plant operation and availability due to advances in digital and other control technologies. Digital retrofits of control systems in US nuclear plants are occurring now. Designs of control and protection systems for advanced LWRs are based on digital technology. The use of small inexpensive, fast, large-capacity computers in these designs is the first step of an evolutionary process described in this paper. Under the sponsorship of the US Department of Energy (DOE), Oak Ridge National Laboratory, Argonne National Laboratory, GE Nuclear Energy and several universities are performing research and development in the application of advances in control theory, software engineering, advanced computer architectures, artificial intelligence, and man-machine interface analysis to control system design. The target plant concept for the work described in this paper is the Power Reactor Inherently Safe Module reactor (PRISM), an advanced modular liquid metal reactor concept. This and other reactor designs which provide strong passive responses to operational upsets or accidents afford good opportunities to apply these advances in control technology. 18 refs., 5 figs.

  5. Adhesive lithography for fabricating organic electronic and optoelectronics devices.

    PubMed

    Wang, Zhe; Xing, Rubo; Yu, Xinhong; Han, Yanchun

    2011-07-01

    Improvements in organic electronic materials have led to novel device applications, ranging from large-area flexible displays to lightweight plastic electronics. Progress on these applications would benefit from development of low-cost fabrication techniques for organic semiconductors. In this review, several fabrication processes based on adhesion force (i.e. van der Waals forces, thiol-metal reactions, and cold welding) are introduced. These patterning techniques are dry patterning techniques, i.e., the electronic materials are patterned from the raised regions of molds onto a substrate directly by additive or subtractive patterning methods. Patterning of organic small molecule, polymer thin films and metal electrodes by adhesive lithography is demonstrated. The operating properties of patterned organic light-emitting diodes (OLEDs) and organic thin film transistors (OTFTs) are comparable with the performance of devices fabricated by conventional evaporation deposition methods.

  6. Adhesive lithography for fabricating organic electronic and optoelectronics devices

    NASA Astrophysics Data System (ADS)

    Wang, Zhe; Xing, Rubo; Yu, Xinhong; Han, Yanchun

    2011-07-01

    Improvements in organic electronic materials have led to novel device applications, ranging from large-area flexible displays to lightweight plastic electronics. Progress on these applications would benefit from development of low-cost fabrication techniques for organic semiconductors. In this review, several fabrication processes based on adhesion force (i.e. van der Waals forces, thiol-metal reactions, and cold welding) are introduced. These patterning techniques are dry patterning techniques, i.e., the electronic materials are patterned from the raised regions of molds onto a substrate directly by additive or subtractive patterning methods. Patterning of organic small molecule, polymer thin films and metal electrodes by adhesive lithography is demonstrated. The operating properties of patterned organic light-emitting diodes (OLEDs) and organic thin film transistors (OTFTs) are comparable with the performance of devices fabricated by conventional evaporation deposition methods.

  7. Nanofluidic devices for dielectrophoretic mobility shift assays by soft lithography

    NASA Astrophysics Data System (ADS)

    Viefhues, M.; Regtmeier, J.; Anselmetti, D.

    2012-11-01

    We report development and application of 3D structured nano-microfluidic devices that were produced via soft lithography with poly(dimethylsiloxane). The procedure does not rely on hazardous or time-consuming production steps. Here, the nanochannels were created by channel-spanning ridges that reduce the flow height of the microchannel. Several realizations of the ridge layout and nanochannel height are demonstrated, depicting the high potential of this technique. The nanochannels proved to be stable even for width-to-height aspect ratios of 873:1. Additionally, an application of these submicrometer structures is presented with a new technique of a dielectrophoretic mobility shift assay (DEMSA). The DEMSA was used to detect different DNA variants, e.g. protein-DNA-complexes, via a shift in (dielectrophoretically retarded) migration velocities within an array of nanoslits.

  8. Nanoimprint Lithography on curved surfaces prepared by fused deposition modelling

    NASA Astrophysics Data System (ADS)

    Köpplmayr, Thomas; Häusler, Lukas; Bergmair, Iris; Mühlberger, Michael

    2015-06-01

    Fused deposition modelling (FDM) is an additive manufacturing technology commonly used for modelling, prototyping and production applications. The achievable surface roughness is one of its most limiting aspects. It is however of great interest to create well-defined (nanosized) patterns on the surface for functional applications such as optical effects, electronics or bio-medical devices. We used UV-curable polymers of different viscosities and flexible stamps made of poly(dimethylsiloxane) (PDMS) to perform Nanoimprint Lithography (NIL) on FDM-printed curved parts. Substrates with different roughness and curvature were prepared using a commercially available 3D printer. The nanoimprint results were characterized by optical light microscopy, profilometry and atomic force microscopy (AFM). Our experiments show promising results in creating well-defined microstructures on the 3D-printed parts.

  9. Fabrication of Protein Dot Arrays via Particle Lithography

    PubMed Central

    Taylor, Zachary R.; Patel, Krupa; Spain, Travis; Keay, Joel C.; Jernigen, Jeremy D.; Sanchez, Ernest S.; Grady, Brian P.; Johnson, Matthew B.; Schmidtke, David W.

    2009-01-01

    The ability to pattern a surface with proteins on both the nanometer and micrometer scale has attracted considerable interest due to its applications in the fields of biomaterials, biosensors, and cell adhesion. Here we describe a simple particle lithography technique to fabricate substrates with hexagonally patterned dots of protein surrounded by a protein-repellant layer of poly(ethylene glycol) (PEG). Using this bottom-up approach, dot arrays of three different proteins (fibrinogen, P-selectin, and human serum albumin) were fabricated. The size of the protein dots (450 nm - 1.1 μm) was independent of the protein immobilized, but could be varied by changing the size of the latex spheres (diameter = 2 - 10 μm) utilized in assembling the lithographic bead monolayer. These results suggest that this technique can be extended to other biomolecules and will be useful in applications where arrays of protein dots are desired. PMID:19670836

  10. Advances in carbon nanotube based electrochemical sensors for bioanalytical applications.

    PubMed

    Vashist, Sandeep Kumar; Zheng, Dan; Al-Rubeaan, Khalid; Luong, John H T; Sheu, Fwu-Shan

    2011-01-01

    Electrochemical (EC) sensing approaches have exploited the use of carbon nanotubes (CNTs) as electrode materials owing to their unique structures and properties to provide strong electrocatalytic activity with minimal surface fouling. Nanofabrication and device integration technologies have emerged along with significant advances in the synthesis, purification, conjugation and biofunctionalization of CNTs. Such combined efforts have contributed towards the rapid development of CNT-based sensors for a plethora of important analytes with improved detection sensitivity and selectivity. The use of CNTs opens an opportunity for the direct electron transfer between the enzyme and the active electrode area. Of particular interest are also excellent electrocatalytic activities of CNTs on the redox reaction of hydrogen peroxide and nicotinamide adenine dinucleotide, two major by-products of enzymatic reactions. This excellent electrocatalysis holds a promising future for the simple design and implementation of on-site biosensors for oxidases and dehydrogenases with enhanced selectivity. To date, the use of an anti-interference layer or an artificial electron mediator is critically needed to circumvent unwanted endogenous electroactive species. Such interfering species are effectively suppressed by using CNT based electrodes since the oxidation of NADH, thiols, hydrogen peroxide, etc. by CNTs can be performed at low potentials. Nevertheless, the major future challenges for the development of CNT-EC sensors include miniaturization, optimization and simplification of the procedure for fabricating CNT based electrodes with minimal non-specific binding, high sensitivity and rapid response followed by their extensive validation using "real world" samples. A high resistance to electrode fouling and selectivity are the two key pending issues for the application of CNT-based biosensors in clinical chemistry, food quality and control, waste water treatment and bioprocessing.

  11. Hafnium zirconate gate dielectric for advanced gate stack applications

    NASA Astrophysics Data System (ADS)

    Hegde, R. I.; Triyoso, D. H.; Samavedam, S. B.; White, B. E.

    2007-04-01

    We report on the development of a hafnium zirconate (HfZrO4) alloy gate dielectric for advanced gate stack applications. The HfZrO4 and hafnium dioxide (HfO2) films were formed by atomic layer deposition using metal halides and heavy water as precursors. The HfZrO4 material properties were examined and compared with those of HfO2 by a wide variety of analytical methods. The dielectric properties, device performance, and reliability of HfZrO4 were investigated by fabricating HfZrO4/tantalum carbide (TaxCy) metal-oxide-semiconductor field effect transistor. The HfZrO4 dielectric film has smaller band gap, smaller and more uniform grains, less charge traps, and more uniform film quality than HfO2. The HfZrO4 dielectric films exhibited good thermal stability with silicon. Compared to HfO2, the HfZrO4 gate dielectric showed lower capacitance equivalent thickness value, higher transconductance, less charge trapping, higher drive current, lower threshold voltage (Vt), reduced capacitance-voltage (C-V ) hysteresis, lower interface state density, superior wafer level thickness uniformity, and longer positive bias temperature instability lifetime. Incorporation of zirconium dioxide (ZrO2) into HfO2 enhances the dielectric constant (k ) of the resulting HfZrO4 which is associated with structural phase transformation from mainly monoclinic to tetragonal. The tetragonal phase increases the k value of HfZrO4 dielectric to a large value as predicted. The improved device characteristics are attributed to less oxygen vacancy in the fine grained microstructure of HfZrO4 films.

  12. Microstructurally tailored ceramics for advanced energy applications by thermoreversible gelcasting

    NASA Astrophysics Data System (ADS)

    Shanti, Noah Omar

    Thermoreversible gelcasting (TRG) is an advantageous technique for rapidly producing bulk, net-shape ceramics and laminates. In this method, ceramic powder is suspended in warm acrylate triblock copolymer/alcohol solutions that reversibly gel upon cooling by the formation of endblock aggregates, to produce slurries which are cast into molds. Gel properties can be tailored by controlling the endblock and midblock lengths of the copolymer network-former and selecting an appropriate alcohol solvent. This research focuses on expanding and improving TRG techniques, focusing specifically on advanced energy applications including the solid oxide fuel cell (SOFC). Rapid drying of filled gels can lead to warping and cracking caused by high differential capillary stresses. A new drying technique using concentrated, alcohol-based solutions as liquid desiccants (LDs) to greatly reduce warping is introduced. The optimal LD is a poly(tert-butyl acrylate)/isopropyl alcohol solution with 5 mol% tert-butyl acrylate units. Alcohol emissions during drying are completely eliminated by combining initial drying in an LD with final stage drying in a vacuum oven having an in-line solvent trap. Porous ceramics are important structures for many applications, including SOFCs. Pore network geometries are tailored by the addition of fugitive fillers to TRG slurries. Uniform spherical, bimodal spherical and uniform fibrous fillers are used. Three-dimensional pore structures are visualized by X-ray computed tomography, allowing for direct measurements of physical parameters such as concentration and morphology as well as transport properties such as tortuosity. Tortuosity values as low as 1.52 are achieved when 60 vol% of solids are uniform spherical filler. Functionally graded laminates with layers ranging from 10 mum to > 1 mm thick are produced with a new technique that combines TRG with tape casting. Gels used for bulk casting are not suitable for use with tape casting, and appropriate base

  13. Advanced applications of cosmic-ray muon radiography

    NASA Astrophysics Data System (ADS)

    Perry, John

    The passage of cosmic-ray muons through matter is dominated by the Coulomb interaction with electrons and atomic nuclei. The muon's interaction with electrons leads to continuous energy loss and stopping through the process of ionization. The muon's interaction with nuclei leads to angular diffusion. If a muon stops in matter, other processes unfold, as discussed in more detail below. These interactions provide the basis for advanced applications of cosmic-ray muon radiography discussed here, specifically: 1) imaging a nuclear reactor with near horizontal muons, and 2) identifying materials through the analysis of radiation lengths weighted by density and secondary signals that are induced by cosmic-ray muon trajectories. We have imaged a nuclear reactor, type AGN-201m, at the University of New Mexico, using data measured with a particle tracker built from a set of sealed drift tubes, the Mini Muon Tracker (MMT). Geant4 simulations were compared to the data for verification and validation. In both the data and simulation, we can identify regions of interest in the reactor including the core, moderator, and shield. This study reinforces our claims for using muon tomography to image reactors following an accident. Warhead and special nuclear materials (SNM) imaging is an important thrust for treaty verification and national security purposes. The differentiation of SNM from other materials, such as iron and aluminum, is useful for these applications. Several techniques were developed for material identification using cosmic-ray muons. These techniques include: 1) identifying the radiation length weighted by density of an object and 2) measuring the signals that can indicate the presence of fission and chain reactions. By combining the radiographic images created by tracking muons through a target plane with the additional fission neutron and gamma signature, we are able to locate regions that are fissionable from a single side. The following materials were imaged

  14. Recent advances in engineering microparticles and their nascent utilization in biomedical delivery and diagnostic applications.

    PubMed

    Choi, Andrew; Seo, Kyoung Duck; Kim, Do Wan; Kim, Bum Chang; Kim, Dong Sung

    2017-02-14

    Complex microparticles (MPs) bearing unique characteristics such as well-tailored sizes, various morphologies, and multi-compartments have been attempted to be produced by many researchers in the past decades. However, a conventionally used method of fabricating MPs, emulsion polymerization, has a limitation in achieving the aforementioned characteristics and several approaches such as the microfluidics-assisted (droplet-based microfluidics and flow lithography-based microfluidics), electrohydrodynamics (EHD)-based, centrifugation-based, and template-based methods have been recently suggested to overcome this limitation. The outstanding features of complex MPs engineered through these suggested methods have provided new opportunities for MPs to be applied in a wider range of applications including cell carriers, drug delivery agents, active pigments for display, microsensors, interface stabilizers, and catalyst substrates. Overall, the engineered MPs expose their potential particularly in the field of biomedical engineering as the increased complexity in the engineered MPs fulfills well the requirements of the high-end applications. This review outlines the current trends of newly developed techniques used for engineered MPs fabrication and focuses on the current state of engineered MPs in biomedical applications.

  15. Aqueous multiphoton lithography with multifunctional silk-centred bio-resists

    PubMed Central

    Sun, Yun-Lu; Li, Qi; Sun, Si-Ming; Huang, Jing-Chun; Zheng, Bo-Yuan; Chen, Qi-Dai; Shao, Zheng-Zhong; Sun, Hong-Bo

    2015-01-01

    Silk and silk fibroin, the biomaterial from nature, nowadays are being widely utilized in many cutting-edge micro/nanodevices/systems via advanced micro/nanofabrication techniques. Herein, for the first time to our knowledge, we report aqueous multiphoton lithography of diversiform-regenerated-silk-fibroin-centric inks using noncontact and maskless femtosecond laser direct writing (FsLDW). Initially, silk fibroin was FsLDW-crosslinked into arbitrary two/three-dimensional micro/nanostructures with good elastic properties merely using proper photosensitizers. More interestingly, silk/metal composite micro/nanodevices with multidimension-controllable metal content can be FsLDW-customized through laser-induced simultaneous fibroin oxidation/crosslinking and metal photoreduction using the simplest silk/Ag+ or silk/[AuCl4]− aqueous resists. Noticeably, during FsLDW, fibroin functions as biological reductant and matrix, while metal ions act as the oxidant. A FsLDW-fabricated prototyping silk/Ag microelectrode exhibited 104-Ω−1 m−1-scale adjustable electric conductivity. This work not only provides a powerful development to silk micro/nanoprocessing techniques but also creates a novel way to fabricate multifunctional metal/biomacromolecule complex micro/nanodevices for applications such as micro/nanoscale mechanical and electrical bioengineering and biosystems. PMID:26472600

  16. Aqueous multiphoton lithography with multifunctional silk-centred bio-resists

    NASA Astrophysics Data System (ADS)

    Sun, Yun-Lu; Li, Qi; Sun, Si-Ming; Huang, Jing-Chun; Zheng, Bo-Yuan; Chen, Qi-Dai; Shao, Zheng-Zhong; Sun, Hong-Bo

    2015-10-01

    Silk and silk fibroin, the biomaterial from nature, nowadays are being widely utilized in many cutting-edge micro/nanodevices/systems via advanced micro/nanofabrication techniques. Herein, for the first time to our knowledge, we report aqueous multiphoton lithography of diversiform-regenerated-silk-fibroin-centric inks using noncontact and maskless femtosecond laser direct writing (FsLDW). Initially, silk fibroin was FsLDW-crosslinked into arbitrary two/three-dimensional micro/nanostructures with good elastic properties merely using proper photosensitizers. More interestingly, silk/metal composite micro/nanodevices with multidimension-controllable metal content can be FsLDW-customized through laser-induced simultaneous fibroin oxidation/crosslinking and metal photoreduction using the simplest silk/Ag+ or silk/[AuCl4]- aqueous resists. Noticeably, during FsLDW, fibroin functions as biological reductant and matrix, while metal ions act as the oxidant. A FsLDW-fabricated prototyping silk/Ag microelectrode exhibited 104-Ω-1 m-1-scale adjustable electric conductivity. This work not only provides a powerful development to silk micro/nanoprocessing techniques but also creates a novel way to fabricate multifunctional metal/biomacromolecule complex micro/nanodevices for applications such as micro/nanoscale mechanical and electrical bioengineering and biosystems.

  17. Aqueous multiphoton lithography with multifunctional silk-centred bio-resists.

    PubMed

    Sun, Yun-Lu; Li, Qi; Sun, Si-Ming; Huang, Jing-Chun; Zheng, Bo-Yuan; Chen, Qi-Dai; Shao, Zheng-Zhong; Sun, Hong-Bo

    2015-10-16

    Silk and silk fibroin, the biomaterial from nature, nowadays are being widely utilized in many cutting-edge micro/nanodevices/systems via advanced micro/nanofabrication techniques. Herein, for the first time to our knowledge, we report aqueous multiphoton lithography of diversiform-regenerated-silk-fibroin-centric inks using noncontact and maskless femtosecond laser direct writing (FsLDW). Initially, silk fibroin was FsLDW-crosslinked into arbitrary two/three-dimensional micro/nanostructures with good elastic properties merely using proper photosensitizers. More interestingly, silk/metal composite micro/nanodevices with multidimension-controllable metal content can be FsLDW-customized through laser-induced simultaneous fibroin oxidation/crosslinking and metal photoreduction using the simplest silk/Ag(+) or silk/[AuCl4](-) aqueous resists. Noticeably, during FsLDW, fibroin functions as biological reductant and matrix, while metal ions act as the oxidant. A FsLDW-fabricated prototyping silk/Ag microelectrode exhibited 10(4)-Ω(-1 ) m(-1)-scale adjustable electric conductivity. This work not only provides a powerful development to silk micro/nanoprocessing techniques but also creates a novel way to fabricate multifunctional metal/biomacromolecule complex micro/nanodevices for applications such as micro/nanoscale mechanical and electrical bioengineering and biosystems.

  18. Soft molding lithography of conjugated polymers

    NASA Astrophysics Data System (ADS)

    Pisignano, Dario; Persano, Luana; Cingolani, Roberto; Gigli, Giuseppe; Babudri, Francesco; Farinola, Gianluca M.; Naso, Francesco

    2004-02-01

    We report on the nanopatterning of conjugated polymers by soft molding, and exploit the glass transition of the organic compound in conformal contact with an elastomeric element. We succeeded in printing different compounds with resolution down to 300 nm at temperatures up to 300 °C in vacuum. No significant variation of the photoluminescence (PL) spectra nor heavy degradation of the PL quantum yield was observed after the lithography process. Based on the high resolution achieved and on the well-retained luminescence properties of the patterned compounds, we conclude that high-temperature soft lithography is a valid, flexible and straightforward technique for one-step realization of organic-based devices.

  19. Implementation of assist features in EUV lithography

    NASA Astrophysics Data System (ADS)

    Jiang, Fan; Burkhardt, Martin; Raghunathan, Ananthan; Torres, Andres; Gupta, Rachit; Word, James

    2015-03-01

    The introduction of EUV lithography will happen at a critical feature pitch which corresponds to a k1 factor of roughly 0.45. While this number seems not very aggressive compared to recent ArF lithography nodes, the number is sufficiently low that the introduction of assist features has to be considered. While the small NA makes the k1 factor larger, the depth of focus still needs to be scaled down with wavelength. However the exposure tool's focus control is not greatly improved over the ArF tools, so other solutions to improve the depth of focus, e.g. SRAFs, are needed. On the other hand, sub-resolution assist features (SRAFs) require very small mask dimensions, which make masks more costly to write and inspect. Another disadvantage of SRAFs is the fact that they may cause pattern-dependent best focus shift due to thick mask effects. Those effects can be predicted, but the shift of best focus and the associated tilt of Bossung curves make the process more difficult to control. We investigate the impact of SRAFs on printing in EUV lithography and evaluate advantages and disadvantages. By using image quality parameters such as best focus (BF), and depth of focus (DOF), respectively with and without SRAFs, we will answer the question if we can gain a net benefit for 1D and 2D patterns by adding SRAFs. SRAFs will only be introduced if any net improvement in process variation (PV) outweighs the additional expense of assist patterning on the mask. In this paper, we investigate the difference in printing behavior of symmetric and asymmetric SRAF placement and whether through slit effect needs to be considered in SRAF placement for EUV lithography.

  20. Deep-UV microsphere projection lithography.

    PubMed

    Bonakdar, Alireza; Rezaei, Mohsen; Brown, Robert L; Fathipour, Vala; Dexheimer, Eric; Jang, Sung Jun; Mohseni, Hooman

    2015-06-01

    In this Letter, we present a single-exposure deep-UV projection lithography at 254-nm wavelength that produces nanopatterns in a scalable area with a feature size of 80 nm. In this method, a macroscopic lens projects a pixelated optical mask on a monolayer of hexagonally arranged microspheres that reside on the Fourier plane and image the mask's pattern into a photoresist film. Our macroscopic lens shrinks the size of the mask by providing an imaging magnification of ∼1.86×10(4), while enhancing the exposure power. On the other hand, microsphere lens produces a sub-diffraction limit focal point-a so-called photonic nanojet-based on the near-surface focusing effect, which ensures an excellent patterning accuracy against the presence of surface roughness. Ray-optics simulation is utilized to design the bulk optics part of the lithography system, while a wave-optics simulation is implemented to simulate the optical properties of the exposed regions beneath the microspheres. We characterize the lithography performance in terms of the proximity effect, lens aberration, and interference effect due to refractive index mismatch between photoresist and substrate.

  1. Advanced nanomaterials–sustainable preparation and their catalytic applications

    EPA Science Inventory

    Sustainable nanomaterials have attracted great attention as highly functionalized nanocatalysts in diverse forms including solid-supported nanocatalysts, graphene materials, and core-shell catalysts among other nanostructures. Technology advancements in last decades have allowed ...

  2. Application of advanced technologies to small, short-haul aircraft

    NASA Technical Reports Server (NTRS)

    Andrews, D. G.; Brubaker, P. W.; Bryant, S. L.; Clay, C. W.; Giridharadas, B.; Hamamoto, M.; Kelly, T. J.; Proctor, D. K.; Myron, C. E.; Sullivan, R. L.

    1978-01-01

    The results of a preliminary design study which investigates the use of selected advanced technologies to achieve low cost design for small (50-passenger), short haul (50 to 1000 mile) transports are reported. The largest single item in the cost of manufacturing an airplane of this type is labor. A careful examination of advanced technology to airframe structure was performed since one of the most labor-intensive parts of the airplane is structures. Also, preliminary investigation of advanced aerodynamics flight controls, ride control and gust load alleviation systems, aircraft systems and turbo-prop propulsion systems was performed. The most beneficial advanced technology examined was bonded aluminum primary structure. The use of this structure in large wing panels and body sections resulted in a greatly reduced number of parts and fasteners and therefore, labor hours. The resultant cost of assembled airplane structure was reduced by 40% and the total airplane manufacturing cost by 16% - a major cost reduction. With further development, test verification and optimization appreciable weight saving is also achievable. Other advanced technology items which showed significant gains are as follows: (1) advanced turboprop-reduced block fuel by 15.30% depending on range; (2) configuration revisions (vee-tail)-empennage cost reduction of 25%; (3) leading-edge flap addition-weight reduction of 2500 pounds.

  3. Polymeric waveguide Bragg grating filter using soft lithography

    NASA Astrophysics Data System (ADS)

    Kocabas, Askin; Aydinli, Atilla

    2006-10-01

    We use the soft lithography technique to fabricate a polymeric waveguide Bragg grating filter. Master grating structure is patterned by e-beam lithography. Using an elastomeric stamp and capillary action, uniform grating structures with very thin residual layers are transferred to the UV curable polymer without the use of an imprint machine. The waveguide layer based on BCB optical polymer is fabricated by conventional optical lithography. This approach provides processing simplicity to fabricate Bragg grating filters.

  4. Software-based data path for raster-scanned multi-beam mask lithography

    NASA Astrophysics Data System (ADS)

    Rajagopalan, Archana; Agarwal, Ankita; Buck, Peter; Geller, Paul; Hamaker, H. Christopher; Rao, Nagswara

    2016-10-01

    According to the 2013 SEMATECH Mask Industry Survey,i roughly half of all photomasks are produced using laser mask pattern generator ("LMPG") lithography. LMPG lithography can be used for all layers at mature technology nodes, and for many non-critical and semi-critical masks at advanced nodes. The extensive use of multi-patterning at the 14-nm node significantly increases the number of critical mask layers, and the transition in wafer lithography from positive tone resist to negative tone resist at the 14-nm design node enables the switch from advanced binary masks back to attenuated phase shifting masks that require second level writes to remove unwanted chrome. LMPG lithography is typically used for second level writes due to its high productivity, absence of charging effects, and versatile non-actinic alignment capability. As multi-patterning use expands from double to triple patterning and beyond, the number of LMPG second level writes increases correspondingly. The desire to reserve the limited capacity of advanced electron beam writers for use when essential is another factor driving the demand for LMPG capacity. The increasing demand for cost-effective productivity has kept most of the laser mask writers ever manufactured running in production, sometimes long past their projected lifespan, and new writers continue to be built based on hardware developed some years ago.ii The data path is a case in point. While state-ofthe- art when first introduced, hardware-based data path systems are difficult to modify or add new features to meet the changing requirements of the market. As data volumes increase, design styles change, and new uses are found for laser writers, it is useful to consider a replacement for this critical subsystem. The availability of low-cost, high-performance, distributed computer systems combined with highly scalable EDA software lends itself well to creating an advanced data path system. EDA software, in routine production today, scales

  5. Expected innovations of optical lithography in the next 10 years

    NASA Astrophysics Data System (ADS)

    Owa, Soichi; Hirayanagi, Noriyuki

    2016-03-01

    In the past 10 years, immersion lithography has been the most effective high volume manufacturing method for the critical layers of semiconductor devices. Thinking of the next 10 years, we can expect continuous improvement on existing 300 mm wafer scanners with better accuracy and throughput to enhance the total output value per input cost. This value productivity, however, can be upgraded also by larger innovations which might happen in optical lithography. In this paper, we will discuss the possibilities and the impossibilities of potential innovation ideas of optical lithography, which are 450 mm wafer, optical maskless, multicolor lithography, and metamaterial.

  6. Polarization manipulation in single refractive prism based holography lithography

    NASA Astrophysics Data System (ADS)

    Xiong, Wenjie; Xu, Yi; Xiao, Yujian; Lv, Xiaoxu; Wu, Lijun

    2015-01-01

    We propose theoretically and demonstrate experimentally a simple but effective strategy for polarization manipulation in single refractive prism based holographic lithography. By tuning the polarization of a single laser beam, we can obtain the pill shape interference pattern with a high-contrast where a complex optical setup and multiple polarizers are needed in the conventional holography lithography. Fabrication of pill shape two-dimensional polymer photonic crystals using one beam and one shoot holography lithography is shown as an example to support our theoretical results. This integrated polarization manipulation technique can release the crucial stability restrictions imposed on the multiple beams holography lithography.

  7. Extreme-UV lithography system

    DOEpatents

    Replogle, William C.; Sweatt, William C.

    2001-01-01

    A photolithography system that employs a condenser that includes a series of aspheric mirrors on one side of a small, incoherent source of radiation producing a series of beams is provided. Each aspheric mirror images the quasi point source into a curved line segment. A relatively small arc of the ring image is needed by the camera; all of the beams are so manipulated that they all fall onto this same arc needed by the camera. Also, all of the beams are aimed through the camera's virtual entrance pupil. The condenser includes a correcting mirror for reshaping a beam segment which improves the overall system efficiency. The condenser efficiently fills the larger radius ringfield created by today's advanced camera designs. The system further includes (i) means for adjusting the intensity profile at the camera's entrance pupil or (ii) means for partially shielding the illumination imaging onto the mask or wafer. The adjusting means can, for example, change at least one of: (i) partial coherence of the photolithography system, (ii) mask image illumination uniformity on the wafer or (iii) centroid position of the illumination flux in the entrance pupil. A particularly preferred adjusting means includes at least one vignetting mask that covers at least a portion of the at least two substantially equal radial segments of the parent aspheric mirror.

  8. Advances in Thin Film Sensor Technologies for Engine Applications

    NASA Technical Reports Server (NTRS)

    Lei, Jih-Fen; Martin, Lisa C.; Will, Herbert A.

    1997-01-01

    Advanced thin film sensor techniques that can provide accurate surface strain and temperature measurements are being developed at NASA Lewis Research Center. These sensors are needed to provide minimally intrusive characterization of advanced materials (such as ceramics and composites) and structures (such as components for Space Shuttle Main Engine, High Speed Civil Transport, Advanced Subsonic Transports and General Aviation Aircraft) in hostile, high-temperature environments and for validation of design codes. This paper presents two advanced thin film sensor technologies: strain gauges and thermocouples. These sensors are sputter deposited directly onto the test articles and are only a few micrometers thick; the surface of the test article is not structurally altered and there is minimal disturbance of the gas flow over the surface. The strain gauges are palladium-13% chromium based and the thermocouples are platinum-13% rhodium vs. platinum. The fabrication techniques of these thin film sensors in a class 1000 cleanroom at the NASA Lewis Research Center are described. Their demonstration on a variety of engine materials, including superalloys, ceramics and advanced ceramic matrix composites, in several hostile, high-temperature test environments are discussed.

  9. Field Emitter Arrays and Displays Produced by Ion Tracking Lithography

    SciTech Connect

    Felter, T E; Musket, R G; Bernhardt, A F

    2004-12-28

    When ions of sufficient electronic energy loss traverse a dielectric film or foil, they alter the chemical bonding along their nominally straight path within the material. A suitable etchant can quickly dissolve these so-called latent tracks leaving holes of small diameter ({approx}10nm) but long length - several microns. Continuing the etching process gradually increases the diameter reproducibly and uniformly. The trackable medium can be applied as a uniform film onto large substrates. The small, monodisperse holes produced by this track etching can be used in conjunction with additional thin film processing to create functional structures attached to the substrate. For example, Lawrence Livermore National Laboratory and Candescent Technologies Corporation (CTC) co-developed a process to make arrays of gated field emitters ({approx}100nm diameter electron guns) for CTC's ThinCRT{trademark} displays, which have been fabricated to diagonal dimensions > 13. Additional technological applications of ion tracking lithography will be briefly covered.

  10. "Sketch and Peel" Lithography for High-Resolution Multiscale Patterning.

    PubMed

    Chen, Yiqin; Xiang, Quan; Li, Zhiqin; Wang, Yasi; Meng, Yuhan; Duan, Huigao

    2016-05-11

    We report a unique lithographic process, termed "Sketch and Peel" lithography (SPL), for fast, clean, and reliable patterning of metallic structures from tens of nanometers to submillimeter scale using direct writing technology. The key idea of SPL process is to define structures using their presketched outlines as the templates for subsequent selective peeling of evaporated metallic layer. With reduced exposure area, SPL process enables significantly improved patterning efficiency up to hundreds of times higher and greatly mitigated proximity effect compared to current direct writing strategy. We demonstrate that multiscale hierarchical metallic structures with arbitrary shapes and minimal feature size of ∼15 nm could be defined with high fidelity using SPL process for potential nanoelectronic and nano-optical applications.

  11. Polystyrene negative resist for high-resolution electron beam lithography

    PubMed Central

    2011-01-01

    We studied the exposure behavior of low molecular weight polystyrene as a negative tone electron beam lithography (EBL) resist, with the goal of finding the ultimate achievable resolution. It demonstrated fairly well-defined patterning of a 20-nm period line array and a 15-nm period dot array, which are the densest patterns ever achieved using organic EBL resists. Such dense patterns can be achieved both at 20 and 5 keV beam energies using different developers. In addition to its ultra-high resolution capability, polystyrene is a simple and low-cost resist with easy process control and practically unlimited shelf life. It is also considerably more resistant to dry etching than PMMA. With a low sensitivity, it would find applications where negative resist is desired and throughput is not a major concern. PMID:21749679

  12. Development of CMOS-compatible membrane projection lithography

    NASA Astrophysics Data System (ADS)

    Burckel, D. Bruce; Samora, Sally; Wiwi, Mike; Wendt, Joel R.

    2013-09-01

    Recently we have demonstrated membrane projection lithography (MPL) as a fabrication approach capable of creating 3D structures with sub-micron metallic inclusions for use in metamaterial and plasmonic applications using polymer material systems. While polymers provide several advantages in processing, they are soft and subject to stress-induced buckling. Furthermore, in next generation active photonic structures, integration of photonic components with CMOS electronics is desirable. While the MPL process flow is conceptually simple, it requires matrix, membrane and backfill materials with orthogonal processing deposition/removal chemistries. By transitioning the MPL process flow into an entirely inorganic material set based around silicon and standard CMOS-compatible materials, several elements of silicon microelectronics can be integrated into photonic devices at the unit-cell scale. This paper will present detailed fabrication and characterization data of these materials, emphasizing the processing trade space as well as optical characterization of the resulting structures.

  13. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography.

    PubMed

    Tarrio, Charles; Grantham, Steven; Squires, Matthew B; Vest, Robert E; Lucatorto, Thomas B

    2003-01-01

    Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer extreme-ultraviolet stepper mirrors require the highest attainable reflectivity at 13 nm (nearly 70 %), but the central wavelength of the reflectivity of these mirrors must be measured with a wavelength repeatability of 0.001 nm and the peak reflectivity of the reflective masks with a repeatability of 0.12 %. We report on two upgrades of our NIST/DARPA Reflectometry Facility that have given us the ability to achieve 0.1 % repeatability and 0.3 % absolute uncertainty in our reflectivity measurements. A third upgrade, a monochromator with thermal and mechanical stability for improved wavelength repeatability, is currently in the design phase.

  14. Interpreting cost of ownership for mix-and-match lithography

    NASA Astrophysics Data System (ADS)

    Levine, Alan L.; Bergendahl, Albert S.

    1994-05-01

    Cost of ownership modeling is a critical and emerging tool that provides significant insight into the ways to optimize device manufacturing costs. The development of a model to deal with a particular application, mix-and-match lithography, was performed in order to determine the level of cost savings and the optimum ways to create these savings. The use of sensitivity analysis with cost of ownership allows the user to make accurate trade-offs between technology and cost. The use and interpretation of the model results are described in this paper. Parameters analyzed include several manufacturing considerations -- depreciation, maintenance, engineering and operator labor, floorspace, resist, consumables and reticles. Inherent in this study is the ability to customize this analysis for a particular operating environment. Results demonstrate the clear advantages of a mix-and-match approach for three different operating environments. These case studies also demonstrate various methods to efficiently optimize cost savings strategies.

  15. Development of Advanced Seals for Industrial Turbine Applications

    NASA Astrophysics Data System (ADS)

    Chupp, Raymond E.; Aksit, Mahmut F.; Ghasripoor, Farshad; Turnquist, Norman A.; Dinc, Saim; Mortzheim, Jason; Demiroglu, Mehmet

    2002-10-01

    A critical area being addressed to improve industrial turbine performance is reducing the parasitic leakage flows through the various static and dynamic seals. Implementation of advanced seals into General Electric (GE) industrial turbines has progressed well over the last few years with significant operating performance gains achieved. Advanced static seals have been placed in gas turbine hot gas-path junctions and steam turbine packing ring segment end gaps. Brush seals have significantly decreased labyrinth seal leakages in gas turbine compressors and turbine interstages, steam turbine interstage and end packings, industrial compressor shaft seals, and generator seals. Abradable seals are being developed for blade-tip locations in various turbine locations. This presentation summarizes the status of advanced seal development for industrial turbines at GE.

  16. Parachute systems technology: Fundamentals, concepts, and applications: Advanced parachute design

    SciTech Connect

    Peterson, C.W.; Johnson, D.W.

    1987-01-01

    Advances in high-performance parachute systems and the technologies needed to design them are presented in this paper. New parachute design and performance prediction codes are being developed to assist the designer in meeting parachute system performance requirements after a minimum number of flight tests. The status of advanced design codes under development at Sandia National Laboratories is summarized. An integral part of parachute performance prediction is the rational use of existing test data. The development of a data base for parachute design has been initiated to illustrate the effects of inflated diameter, geometric porosity, reefing line length, suspension line length, number of gores, and number of ribbons on parachute drag. Examples of advancements in parachute materials are presented, and recent problems with Mil-Spec broadgoods are reviewed. Finally, recent parachute systems tested at Sandia are summarized to illustrate new uses of old parachutes, new parachute configurations, and underwater recovery of payloads.

  17. Sub-20 nm patterning of thin layer WSe2 by scanning probe lithography

    NASA Astrophysics Data System (ADS)

    Dago, Arancha I.; Ryu, Yu K.; Garcia, Ricardo

    2016-10-01

    The electronic properties of thin layer transition metal dichalcogenides have raised considerable interest in the fabrication of advanced field-effect transistors and ultrasensitive sensors. Downscaling those devices to the nanoscale depends on the development of cost-effective and robust alternative nanolithographies. Here we demonstrate the direct, resist-less and reproducible nanopatterning of tungsten diselenide thin layers. By using oxidation scanning probe lithography (o-SPL) we have generated arrays of dots with a width of 13 nm and periodicity of 40 nm. We have also patterned a point contact of 35 nm and a nanoscale field-effect transistor. The direct and resistless fabrication of WSe2 nanoscale devices by oxidation scanning probe lithography opens a straightforward and reliable method for processing transition metal dichalcogenides materials.

  18. Controlled Segmentation of Metal Nanowire Array by Block Copolymer Lithography and Reversible Ion Loading.

    PubMed

    Mun, Jeong Ho; Cha, Seung Keun; Kim, Ye Chan; Yun, Taeyeong; Choi, Young Joo; Jin, Hyeong Min; Lee, Jae Eun; Jeon, Hyun Uk; Kim, So Youn; Kim, Sang Ouk

    2017-02-20

    Spatial arrangement of 1D nanomaterials may offer enormous opportunities for advanced electronics and photonics. Moreover, morphological complexity and chemical diversity in the nanoscale components may lead to unique properties that are hardly anticipated in randomly distributed homogeneous nanostructures. Here, controlled chemical segmentation of metal nanowire arrays using block copolymer lithography and subsequent reversible metal ion loading are demonstrated. To impose chemical heterogeneity in the nanowires generated by block copolymer lithography, reversible ion loading method highly specific for one particular polymer block is introduced. Reversibility of the metal ion loading enables area-selective localized replacement of metal ions in the self-assembled patterns and creates segmented metal nanowire arrays with different metallic components. Further integration of this method with shear aligning process produces high aligned segmented metal nanowire array with desired local chemical compositions.

  19. 78 FR 71601 - KC Small Hydro LLC; Advanced Hydropower, Inc.; Notice of Preliminary Permit Application Accepted...

    Federal Register 2010, 2011, 2012, 2013, 2014

    2013-11-29

    ... Energy Regulatory Commission KC Small Hydro LLC; Advanced Hydropower, Inc.; Notice of Preliminary Permit... the applicant to KC Small Hydro LLC. (KCS Hydro). On November 5, 2013, Advanced Hydropower, Inc... the feasibility of a hydropower project to be located at the U.S. Army Corps of Engineers'...

  20. 77 FR 8848 - Application for New Awards; Advanced Placement (AP) Test Fee Program

    Federal Register 2010, 2011, 2012, 2013, 2014

    2012-02-15

    ... Application for New Awards; Advanced Placement (AP) Test Fee Program AGENCY: Office of Elementary and Secondary Education, Department of Education. ACTION: Notice. Overview Information: Advanced Placement Test.... Full Text of Announcement I. Funding Opportunity Description Purpose of Program: The AP Test...