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Sample records for al2o3 gate dielectric

  1. Electrical Double Layer Capacitance in a Graphene-embedded Al2O3 Gate Dielectric

    PubMed Central

    Ki Min, Bok; Kim, Seong K.; Jun Kim, Seong; Ho Kim, Sung; Kang, Min-A; Park, Chong-Yun; Song, Wooseok; Myung, Sung; Lim, Jongsun; An, Ki-Seok

    2015-01-01

    Graphene heterostructures are of considerable interest as a new class of electronic devices with exceptional performance in a broad range of applications has been realized. Here, we propose a graphene-embedded Al2O3 gate dielectric with a relatively high dielectric constant of 15.5, which is about 2 times that of Al2O3, having a low leakage current with insertion of tri-layer graphene. In this system, the enhanced capacitance of the hybrid structure can be understood by the formation of a space charge layer at the graphene/Al2O3 interface. The electrical properties of the interface can be further explained by the electrical double layer (EDL) model dominated by the diffuse layer. PMID:26530817

  2. Effects of the interfacial layer on electrical characteristics of Al 2O 3/TiO 2/Al 2O 3 thin films for gate dielectrics

    NASA Astrophysics Data System (ADS)

    Kim, Chang Eun; Yun, Ilgu

    2012-01-01

    Effects of thermal annealing on the electrical properties of Al2O3/TiO2/Al2O3 (ATA) dielectric thin films prepared by atomic layer deposition are investigated. The structural properties and chemical states in the interfacial layer are analyzed with varying the annealing temperature. The dielectric constant and leakage current are affected by the formation of Al2O3-TiO2 composite and interfacial layer including SiOx in the interface by the annealing. The transformation of interfacial layer at the interface of the ATA/Si substrate due to the annealing is a critical point to apply ATA thin films as gate dielectric layers.

  3. Characteristics of Al2O3 gate dielectrics partially fluorinated by a low energy fluorine beam

    NASA Astrophysics Data System (ADS)

    Kim, Sung Woo; Park, Byoung Jae; Kang, Se Koo; Kong, Bo Hyun; Cho, Hyung Koun; Yeom, Geun Young; Heo, Sungho; Hwang, Hyunsang

    2008-11-01

    The partial fluorination of Al2O3 gate dielectrics was examined by exposing an oxide-nitride-aluminum oxide (ONA) stack to a low energy fluorine beam, and its effect on the properties of the ONA was investigated. Exposing ONA to about 10 eV fluorine beam resulted in a 5-nm-thick AlOxFy layer on the ONA by replacing some Al-O to Al-F. The electrical properties such as leakage current and memory window characteristics were improved after fluorination of the ONA, possibly due to the improved charge trapping characteristics through the formation of an AlOxFy layer on the Al2O3 without changing the blocking layer thickness.

  4. PEDOT gate electrodes with PVP/Al2O3 dielectrics for stable high-performance organic TFTs

    NASA Astrophysics Data System (ADS)

    Lee, Young Kyu; Maniruzzaman, Md.; Lee, Chiyoung; Lee, Mi Jung; Lee, Eun-Gu; Lee, Jaegab

    2013-11-01

    A poly(3,4-ethylenedioxythiophene) (PEDOT) gate electrode on a polyestersulfone (PES) substrate was used to fabricate inverted staggered pentacene organic thin film transistors (OTFTs). The PEDOT gate formed on the PES substrate exhibited semi-transparency, high conductivity, and excellent adhesion to the substrate. Prior to the deposition of poly-4-vinyl phenol (PVP) dielectrics, a thin Al2O3 layer (12 nm) was coated onto a PEDOT electrode, providing an effective barrier against inter-diffusion between the PVP dielectrics and the underlying PEDOT gate electrode, and against moisture penetration through the PES substrate. This led to stable high-performance OTFTs consisting of a PEDOT gate electrode and PVP/Al2O3 dielectrics. The combined PVP/Al2O3 dielectrics with PEDOT gate electrodes were successfully implemented in flexible organic TFTs that exhibit excellent compatibility with flexible electronics.

  5. Properties of Ultrathin Al2O3-TiO2 Nanolaminate Films for Gate Dielectric Applications Deposited by Plasma-Assisted Atomic Layer Deposition

    NASA Astrophysics Data System (ADS)

    Garces, Nelson; Meyer, David; Nepal, Neeraj; Wheeler, Virginia; Eddy, Charles

    2012-02-01

    High permittivity dielectrics such as Al2O3, HfO2, Ta2O5, TiO2, etc., are an essential component of aggressively-scaled III-V and graphene field effect transistors (FETs) where insulators are necessary to reduce gate leakage current while maintaining high gate capacitance and charge control of the channel. Atomic layer deposition (ALD) has the capability to deposit hybrid films, or nanolaminates, of two or more dielectrics that have unique properties. Thin [Al2O3+TiO2] nanolaminates with varying TiO2 and Al2O3 content were deposited on n-Si substrates at ˜225-300 C using ALD. A nanolaminate is composed of bilayers, defined as the sum of (x)Al2O3 and (y)TiO2, where x, and y indicate the number of times a component monolayer is repeated. While the overall thickness of the dielectric was held at ˜ 17-20 nm, the relative ratio of Al2O3 to TiO2 in the bilayer stack was varied to evaluate changes in the material properties and electrical performance of the oxides. C-V and I-V measurements on various [(x)TiO2+(y)Al2O3] MOS capacitors were taken. The high-TiO2-content films show limited evidence of oxide charge trapping and relatively large dielectric constants (κ˜15), whereas the high-Al2O3-content films offer a larger optical bandgap and improved suppression of leakage current. We will discuss the properties of very thin nanolaminates and their possible use as gate oxides. Morphological, electrical, and XPS composition assessments will be presented.

  6. ALD TiO2-Al2O3 Stack: An Improved Gate Dielectrics on Ga-polar GaN MOSCAPs

    DOE PAGESBeta

    Wei, Daming; Edgar, James H.; Briggs, Dayrl P.; Srijanto, Bernadeta R.; Retterer, Scott T.; Meyer, III, Harry M.

    2014-10-15

    This research focuses on the benefits and properties of TiO2-Al2O3 nano-stack thin films deposited on Ga2O3/GaN by plasma-assisted atomic layer deposition (PA-ALD) for gate dielectric development. This combination of materials achieved a high dielectric constant, a low leakage current, and a low interface trap density. Correlations were sought between the films’ structure, composition, and electrical properties. The gate dielectrics were approximately 15 nm thick and contained 5.1 nm TiO2, 7.1 nm Al2O3 and 2 nm Ga2O3 as determined by spectroscopic ellipsometry. The interface carbon concentration, as measured by x-ray photoelectron spectroscopy (XPS) depth profile, was negligible for GaN pretreated bymore » thermal oxidation in O2 for 30 minutes at 850°C. The RMS roughness slightly increased after thermal oxidation and remained the same after ALD of the nano-stack, as determined by atomic force microscopy. The dielectric constant of TiO2-Al2O3 on Ga2O3/GaN was increased to 12.5 compared to that of pure Al2O3 (8~9) on GaN. In addition, the nano-stack's capacitance-voltage (C-V) hysteresis was small, with a total trap density of 8.74 × 1011 cm-2. The gate leakage current density (J=2.81× 10-8 A/cm2) was low at +1 V gate bias. These results demonstrate the promising potential of plasma ALD deposited TiO2/Al2O3 for serving as the gate oxide on Ga2O3/GaN based MOS devices.« less

  7. Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal

    NASA Astrophysics Data System (ADS)

    Djara, Vladimir; Czornomaz, Lukas; Deshpande, Veeresh; Daix, Nicolas; Uccelli, Emanuele; Caimi, Daniele; Sousa, Marilyne; Fompeyrine, Jean

    2016-01-01

    We present a tri-gate In0.53Ga0.47As-on-insulator (InGaAs-OI) junctionless field-effect transistor (JLFET) architecture. The fabricated devices feature a 20-nm-thick n-In0.53Ga0.47As channel doped to 1018/cm3 obtained by metal organic chemical vapor phase deposition and direct wafer bonding along with a 3.5-nm-thick Al2O3 gate dielectric deposited by plasma-enhanced atomic layer deposition (PE-ALD). The PE-ALD Al2O3 presents a bandgap of 7.0 eV, a k-value of 8.1 and a breakdown field of 8-10.5 MV/cm. A post-fabrication H2/Ar anneal applied to the PE-ALD Al2O3/In0.53Ga0.47As-OI gate stack yielded a low density of interface traps (Dit) of 7 × 1011/cm2 eV at Ec - E = -0.1 eV along with lower border trap density values than recently reported PE-ALD bi-layer Al2O3/HfO2 and thermal ALD HfO2 gate stacks deposited on In0.53Ga0.47As. The H2/Ar anneal also improved the subthreshold performance of the tri-gate InGaAs-OI JLFETs. After H2/Ar anneal, the long-channel (10 μm) device featured a threshold voltage (VT) of 0.25 V, a subthreshold swing (SS) of 88 mV/dec and a drain-induced barrier lowering (DIBL) of 65 mV/V, while the short-channel (160 nm) device exhibited a VT of 0.1 V, a SS of 127 mV/dec and a DIBL of 218 mV/V. Overall, the tri-gate InGaAs-OI JLFETs showed the best compromise in terms of VT, SS and DIBL compared to the other III-V JLFET architectures reported to date. However, a 15× increase in access resistance was observed after H2/Ar anneal, significantly degrading the maximum drain current of the tri-gate InGaAs-OI JLFETs.

  8. Al2O3 nanocrystals embedded in amorphous Lu2O3 high-k gate dielectric for floating gate memory application

    NASA Astrophysics Data System (ADS)

    Yuan, C. L.; Chan, M. Y.; Lee, P. S.; Darmawan, P.; Setiawan, Y.

    2007-04-01

    The integration of nanoparticles has high potential in technological applications and opens up possibilities of the development of new devices. Compared to the conventional floating gate memory, a structure containing nanocrystals embedded in dielectrics shows high potential to produce a memory with high endurance, low operating voltage, fast write-erase speeds and better immunity to soft errors [S. Tiwari, F. Rana, H. Hanafi et al. 1996 Appl.Phys. Lett. 68, 1377]. A significant improvement on data retention [J. J. Lee, X. Wang et al. 2003 Proceedings of the VLSI Technol. Symposium, p33] can be observed when discrete nanodots are used instead of continuous floating gate as charge storage nodes because local defect related leakage can be reduced efficiently. Furthermore, using a high-k dielectric in place of the conventional SiO2 based dielectric, nanodots flash memory is able to achieve significantly improved programming efficiency and data retention [A. Thean and J. -P. Leburton, 2002 IEEE Potentials 21, 35; D. W. Kim, T. Kim and S. K. Banerjee, 2003 IEEE Trans. Electron Devices 50, 1823]. We have recently successfully developed a method to produce nanodots embedded in high-k gate dielectrics [C. L. Yuan, P. Darmawan, Y. Setiawan and P. S. Lee, 2006 Electrochemical and Solid-State Letters 9, F53; C. L. Yuan, P. Darmawan, Y. Setiawan and P. S. Lee, 2006 Europhys. Lett. 74, 177]. In this paper, we fabricated the memory structure of Al2O3 nanocrystals embedded in amorphous Lu2O3 high k dielectric using pulsed laser ablation. The mean size and density of the Al2O3 nanocrystals are estimated to be about 5 nm and 7x1011 cm-2, respectively. Good electrical performances in terms of large memory window and good data retention were observed. Our preparation method is simple, fast and economical.

  9. Radiation-induced charge trapping in thin Al2O3/SiOxNy/Si(100) gate dielectric stacks.

    SciTech Connect

    D'Emic, Chris; Gusev, Evgeni P.; Schrimpf, Ronald D.; Fleetwood, Daniel M.; Schwank, James Ralph; Felix, James Andrew; Shaneyfelt, Marty Ray; Dodd, Paul Emerson; Meisenheimer, Timothy Lee

    2003-07-01

    We examine the total-dose radiation response of capacitors and transistors with stacked Al{sub 2}O{sub 3} on oxynitride gate dielectrics with Al and poly-Si gates after irradiation with 10 keV X-rays. The midgap voltage shift increases monotonically with dose and depends strongly on both Al{sub 2}O{sub 3} and SiO{sub x}N{sub y} thickness. The thinnest dielectrics, of most interest to industry, are extremely hard to ionizing irradiation, exhibiting only {approx}50 mV of shift at a total dose of 10 Mrad(SiO{sub 2}) for the worst case bias condition. Oxygen anneals are found to improve the total dose radiation response by {approx}50% and induce a small amount of capacitance-voltage hysteresis. Al{sub 2}O{sub 3}/SiO{sub x}N{sub y} dielectrics which receive a {approx}1000 C dopant activation anneal trap {approx}12% more of the initial charge than films annealed at 550 C. Charge pumping measurements show that the interface trap density decreases with dose up to 500 krad(SiO{sub 2}). This surprising result is discussed with respect to hydrogen effects in alternative dielectric materials, and may be the result of radiation-induced hydrogen passivation of some of the near-interfacial defects in these gate dielectrics.

  10. Interfacial and electrical characteristics of Al2O3 gate dielectric on fully depleted SiGe on insulator

    NASA Astrophysics Data System (ADS)

    Di, Zengfeng; Zhang, Miao; Liu, Weili; Shen, Qinwo; Luo, Suhua; Song, Zhitang; Lin, Chenglu; Huang, Anping; Chu, Paul K.

    2005-06-01

    The interfacial and electrical characteristics of as-deposited or annealed A2O3 gate dielectric films grown on fully depleted SiGe-on-insulator are investigated. An interfacial layer composed of SiOx and GeOx is observed in the as-grown film. The interfacial silicate formation is effectively suppressed by GeOx formation. However, GeOx is reduced to Ge and extensive silicate formation occurs after annealing. The formation of silicate and disappearance of GeOx after annealing leads to a decrease in the density of the interfacial states.

  11. Abnormal positive bias stress instability of In-Ga-Zn-O thin-film transistors with low-temperature Al2O3 gate dielectric

    NASA Astrophysics Data System (ADS)

    Chang, Yu-Hong; Yu, Ming-Jiue; Lin, Ruei-Ping; Hsu, Chih-Pin; Hou, Tuo-Hung

    2016-01-01

    Low-temperature atomic layer deposition (ALD) was employed to deposit Al2O3 as a gate dielectric in amorphous In-Ga-Zn-O thin-film transistors fabricated at temperatures below 120 °C. The devices exhibited a negligible threshold voltage shift (ΔVT) during negative bias stress, but a more pronounced ΔVT under positive bias stress with a characteristic turnaround behavior from a positive ΔVT to a negative ΔVT. This abnormal positive bias instability is explained using a two-process model, including both electron trapping and hydrogen release and migration. Electron trapping induces the initial positive ΔVT, which can be fitted using the stretched exponential function. The breakage of residual AlO-H bonds in low-temperature ALD Al2O3 is triggered by the energetic channel electrons. The hydrogen atoms then diffuse toward the In-Ga-Zn-O channel and induce the negative ΔVT through electron doping with power-law time dependence. A rapid partial recovery of the negative ΔVT after stress is also observed during relaxation.

  12. Remote interfacial dipole scattering and electron mobility degradation in Ge field-effect transistors with GeO x /Al2O3 gate dielectrics

    NASA Astrophysics Data System (ADS)

    Wang, Xiaolei; Xiang, Jinjuan; Wang, Shengkai; Wang, Wenwu; Zhao, Chao; Ye, Tianchun; Xiong, Yuhua; Zhang, Jing

    2016-06-01

    Remote Coulomb scattering (RCS) on electron mobility degradation is investigated experimentally in Ge-based metal–oxide–semiconductor field-effect-transistors (MOSFETs) with GeO x /Al2O3 gate stacks. It is found that the mobility increases with greater GeO x thickness (7.8–20.8 Å). The physical origin of this mobility dependence on GeO x thickness is explored. The following factors are excluded: Coulomb scattering due to interfacial traps at GeO x /Ge, phonon scattering, and surface roughness scattering. Therefore, the RCS from charges in gate stacks is studied. The charge distributions in GeO x /Al2O3 gate stacks are evaluated experimentally. The bulk charges in Al2O3 and GeO x are found to be negligible. The density of the interfacial charge is  +3.2  ×  1012 cm‑2 at the GeO x /Ge interface and  ‑2.3  ×  1012 cm‑2 at the Al2O3/GeO x interface. The electric dipole at the Al2O3/GeO x interface is found to be  +0.15 V, which corresponds to an areal charge density of 1.9  ×  1013 cm‑2. The origin of this mobility dependence on GeO x thickness is attributed to the RCS due to the electric dipole at the Al2O3/GeO x interface. This remote dipole scattering is found to play a significant role in mobility degradation. The discovery of this new scattering mechanism indicates that the engineering of the Al2O3/GeO x interface is key for mobility enhancement and device performance improvement. These results are helpful for understanding and engineering Ge mobility enhancement.

  13. Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices.

    PubMed

    Negara, M A; Kitano, M; Long, R D; McIntyre, P C

    2016-08-17

    Nitrogen incorporation to produce negative fixed charge in Al2O3 gate insulator layers is investigated as a path to achieve enhancement mode GaN device operation. A uniform distribution of nitrogen across the resulting AlOxNy films is obtained using N2 plasma enhanced atomic layer deposition (ALD). The flat band voltage (Vfb) increases to a significantly more positive value with increasing nitrogen concentration. Insertion of a 2 nm thick Al2O3 interlayer greatly decreases the trap density of the insulator/GaN interface, and reduces the voltage hysteresis and frequency dispersion of gate capacitance compared to single-layer AlOxNy gate insulators in GaN MOSCAPs. PMID:27459343

  14. O3-sourced atomic layer deposition of high quality Al2O3 gate dielectric for normally-off GaN metal-insulator-semiconductor high-electron-mobility transistors

    NASA Astrophysics Data System (ADS)

    Huang, Sen; Liu, Xinyu; Wei, Ke; Liu, Guoguo; Wang, Xinhua; Sun, Bing; Yang, Xuelin; Shen, Bo; Liu, Cheng; Liu, Shenghou; Hua, Mengyuan; Yang, Shu; Chen, Kevin J.

    2015-01-01

    High quality Al2O3 film grown by atomic layer deposition (ALD), with ozone (O3) as oxygen source, is demonstrated for fabrication of normally-off AlGaN/GaN metal-insulator-semiconductor high-electron-mobility transistors (MIS-HEMTs). Significant suppression of Al-O-H and Al-Al bonds in ALD-Al2O3 has been realized by substituting conventional H2O source with O3. A high dielectric breakdown E-field of 8.5 MV/cm and good TDDB behavior are achieved in a gate dielectric stack consisting of 13-nm O3-Al2O3 and 2-nm H2O-Al2O3 interfacial layer on recessed GaN. By using this 15-nm gate dielectric and a high-temperature gate-recess technique, the density of positive bulk/interface charges in normally-off AlGaN/GaN MIS-HEMTs is remarkably suppressed to as low as 0.9 × 1012 cm-2, contributing to the realization of normally-off operation with a high threshold voltage of +1.6 V and a low specific ON-resistance RON,sp of 0.49 mΩ cm2.

  15. Comparison of interfacial and electrical properties between Al2O3 and ZnO as interface passivation layer of GaAs MOS device with HfTiO gate dielectric

    NASA Astrophysics Data System (ADS)

    Shuyan, Zhu; Jingping, Xu; Lisheng, Wang; Yuan, Huang; Wing Man, Tang

    2015-03-01

    GaAs metal-oxide-semiconductor (MOS) capacitors with HfTiO as the gate dielectric and Al2O3 or ZnO as the interface passivation layer (IPL) are fabricated. X-ray photoelectron spectroscopy reveals that the Al2O3 IPL is more effective in suppressing the formation of native oxides and As diffusion than the ZnO IPL. Consequently, experimental results show that the device with Al2O3 IPL exhibits better interfacial and electrical properties than the device with ZnO IPL: lower interface-state density (7.2 × 1012 eV-1 cm-2), lower leakage current density (3.60 × 10-7 A/cm2 at Vg = 1 V) and good C-V behavior. Project supported by the National Natural Science Foundation of China (Nos. 61176100, 61274112).

  16. High-temperature studies of multiple fluorinated traps within an Al2O3 gate dielectric for E-Mode AlGaN/GaN power MIS-HEMTs

    NASA Astrophysics Data System (ADS)

    Wang, Yun-Hsiang; Liang, Yung C.; Samudra, Ganesh S.; Chu, Po-Ju; Liao, Ya-Chu; Huang, Chih-Fang; Kuo, Wei-Hung; Lo, Guo-Qiang

    2016-02-01

    Normally-off AlGaN/GaN MIS-HEMT devices with multiple fluorinated ALD-Al2O3 layers as the gate dielectric have been reported to achieve a high threshold voltage for normally-off operations with satisfactory performance for both on and off states at room temperature. However, a large swing in gate threshold voltage is found when devices operate at elevated temperatures. Hence, further study of the gate dielectric on the distribution of fluorinated trap states in the energy band are required to assess the gate function at higher temperatures. Through the use of the charge analytical model and Poole-Frenkel trap emission theory, the gate voltage stressing measurement was carried out to accurately find the effective trap state distribution within the Al2O3 energy bandgap created by fluorinated treatments. For the samples fabricated and used in the investigation, we found that a higher population of fluorinated trap states located deeper than 1.1 eV corresponding to emission levels above 200 °C would allow more trapped charges to remain in the dielectric at high temperature for better threshold voltage retention. We also discovered that a higher fluorine treatment power on the gate dielectric could yield a higher trap state density at deeper levels, resulting in better temperature stability.

  17. Silicon diffusion control in atomic-layer-deposited Al2O3/La2O3/Al2O3 gate stacks using an Al2O3 barrier layer.

    PubMed

    Wang, Xing; Liu, Hong-Xia; Fei, Chen-Xi; Yin, Shu-Ying; Fan, Xiao-Jiao

    2015-01-01

    In this study, the physical and electrical characteristics of Al2O3/La2O3/Al2O3/Si stack structures affected by the thickness of an Al2O3 barrier layer between Si substrate and La2O3 layer are investigated after a rapid thermal annealing (RTA) treatment. Time of flight secondary ion mass spectrometry (TOF-SIMS) and X-ray photoelectron spectroscopy (XPS) tests indicate that an Al2O3 barrier layer (15 atomic layer deposition (ALD) cycles, approximately 1.5 nm) plays an important role in suppressing the diffusion of silicon atoms from Si substrate into the La2O3 layer during the annealing process. As a result, some properties of La2O3 dielectric degenerated by the diffusion of Si atoms are improved. Electrical measurements (C-V, J-V) show that the thickness of Al2O3 barrier layer can affect the shift of flat band voltage (V FB) and the magnitude of gate leakage current density. PMID:25897303

  18. Control of Interfacial Properties of Al2O3/Ge Gate Stack Structure Using Radical Nitridation Technique

    NASA Astrophysics Data System (ADS)

    Kato, Kimihiko; Kyogoku, Shinya; Sakashita, Mitsuo; Takeuchi, Wakana; Kondo, Hiroki; Takeuchi, Shotaro; Nakatsuka, Osamu; Zaima, Shigeaki

    2011-10-01

    We have investigated the control of the interfacial properties of Al2O3/Ge gate stack structures by the radical nitridation technique. In the Al2O3/Ge structures formed by the atomic layer deposition method, the interface state density increases with the deposition temperature due to the decrease in the thickness of the Ge oxide interlayer. On the other hand, the hysteresis width of the capacitance-voltage (C-V) characteristics decreases with increasing deposition temperature, which indicates a decrease in the oxide trap density near the interface. We also investigated the control of the interfacial structure by the radical nitridation of Al2O3/Ge to form an interfacial structure after the deposition of a high-k dielectric layer. The results of X-ray photoelectron spectroscopy reveal that an Al2O3/Ge3N4/GeO2/Ge stack structure is formed after the radical nitridation owing to the minimal oxygen diffusion into the Al2O3/Ge interface. Furthermore, the interfacial mixing is suppressed after radical nitridation at less than 300 °C. As a result, we can decrease the interface state density of the Al2O3/Ge sample after the radical nitridation by more than one order of magnitude compared with that without radical nitridation.

  19. Border trap reduction in Al2O3/InGaAs gate stacks

    NASA Astrophysics Data System (ADS)

    Tang, Kechao; Winter, Roy; Zhang, Liangliang; Droopad, Ravi; Eizenberg, Moshe; McIntyre, Paul C.

    2015-11-01

    The effect of Al2O3 atomic layer deposition (ALD) temperature on the border trap density (Nbt) of Al2O3/InGaAs gate stacks is investigated quantitatively, and we demonstrate that lowering the trimethylaluminum (TMA)/water vapor ALD temperature from 270 °C to 120 °C significantly reduces Nbt. The reduction of Nbt coincides with increased hydrogen incorporation in low temperature ALD-grown Al2O3 films during post-gate metal forming gas annealing. It is also found that large-dose (˜6000 L) exposure of the In0.53Ga0.47As (100) surface to TMA immediately after thermal desorption of a protective As2 capping layer is an important step to guarantee the uniformity and reproducibility of high quality Al2O3/InGaAs samples made at low ALD temperatures.

  20. Effects of annealing conditions on the dielectric properties of solution-processed Al2O3 layers for indium-zinc-tin-oxide thin-film transistors.

    PubMed

    Kim, Yong-Hoon; Kim, Kwang-Ho; Park, Sung Kyu

    2013-11-01

    In this paper, the effects of annealing conditions on the dielectric properties of solution-processed aluminum oxide (Al2O3) layers for indium-zinc-tin-oxide (IZTO) thin-film transistors (TFTs) have been investigated. The dielectric properties of Al2O3 layers such as leakage current density and dielectric strength were largely affected by their annealing conditions. In particular, oxygen partial pressure in rapid thermal annealing, and the temperature profile of hot plate annealing had profound effects on the dielectric properties. From a refractive index analysis, the enhanced dielectric properties of Al2O3 gate dielectrics can be attributed to higher film density depending on the annealing conditions. With the low-temperature-annealed Al2O3 gate dielectric at 350 degrees C, solution-processed IZTO TFTs with a field-effect mobility of approximately 2.2 cm2/Vs were successfully fabricated. PMID:24245333

  1. Comparative analysis of the effects of tantalum doping and annealing on atomic layer deposited (Ta2O5)x(Al2O3)1-x as potential gate dielectrics for GaN/AlxGa1-xN/GaN high electron mobility transistors

    NASA Astrophysics Data System (ADS)

    Partida-Manzanera, T.; Roberts, J. W.; Bhat, T. N.; Zhang, Z.; Tan, H. R.; Dolmanan, S. B.; Sedghi, N.; Tripathy, S.; Potter, R. J.

    2016-01-01

    This paper describes a method to optimally combine wide band gap Al2O3 with high dielectric constant (high-κ) Ta2O5 for gate dielectric applications. (Ta2O5)x(Al2O3)1-x thin films deposited by thermal atomic layer deposition (ALD) on GaN-capped AlxGa1-xN/GaN high electron mobility transistor (HEMT) structures have been studied as a function of the Ta2O5 molar fraction. X-ray photoelectron spectroscopy shows that the bandgap of the oxide films linearly decreases from 6.5 eV for pure Al2O3 to 4.6 eV for pure Ta2O5. The dielectric constant calculated from capacitance-voltage measurements also increases linearly from 7.8 for Al2O3 up to 25.6 for Ta2O5. The effect of post-deposition annealing in N2 at 600 °C on the interfacial properties of undoped Al2O3 and Ta-doped (Ta2O5)0.12(Al2O3)0.88 films grown on GaN-HEMTs has been investigated. These conditions are analogous to the conditions used for source/drain contact formation in gate-first HEMT technology. A reduction of the Ga-O to Ga-N bond ratios at the oxide/HEMT interfaces is observed after annealing, which is attributed to a reduction of interstitial oxygen-related defects. As a result, the conduction band offsets (CBOs) of the Al2O3/GaN-HEMT and (Ta2O5)0.16(Al2O3)0.84/GaN-HEMT samples increased by ˜1.1 eV to 2.8 eV and 2.6 eV, respectively, which is advantageous for n-type HEMTs. The results demonstrate that ALD of Ta-doped Al2O3 can be used to control the properties of the gate dielectric, allowing the κ-value to be increased, while still maintaining a sufficient CBO to the GaN-HEMT structure for low leakage currents.

  2. Bottom-gate coplanar graphene transistors with enhanced graphene adhesion on atomic layer deposition Al2O3

    NASA Astrophysics Data System (ADS)

    Park, Dong-Wook; Mikael, Solomon; Chang, Tzu-Hsuan; Gong, Shaoqin; Ma, Zhenqiang

    2015-03-01

    A graphene transistor with a bottom-gate coplanar structure and an atomic layer deposition (ALD) aluminum oxide (Al2O3) gate dielectric is demonstrated. Wetting properties of ALD Al2O3 under different deposition conditions are investigated by measuring the surface contact angle. It is observed that the relatively hydrophobic surface is suitable for adhesion between graphene and ALD Al2O3. To achieve hydrophobic surface of ALD Al2O3, a methyl group (CH3)-terminated deposition method has been developed and compared with a hydroxyl group (OH)-terminated deposition. Based on this approach, bottom-gate coplanar graphene field-effect transistors are fabricated and characterized. A post-thermal annealing process improves the performance of the transistors by enhancing the contacts between the source/drain metal and graphene. The fabricated transistor shows an Ion/Ioff ratio, maximum transconductance, and field-effect mobility of 4.04, 20.1 μS at VD = 0.1 V, and 249.5 cm2/V.s, respectively.

  3. High-k dielectric Al2O3 nanowire and nanoplate field effect sensors for improved pH sensing

    PubMed Central

    Reddy, Bobby; Dorvel, Brian R.; Go, Jonghyun; Nair, Pradeep R.; Elibol, Oguz H.; Credo, Grace M.; Daniels, Jonathan S.; Chow, Edmond K. C.; Su, Xing; Varma, Madoo; Alam, Muhammad A.

    2011-01-01

    Over the last decade, field-effect transistors (FETs) with nanoscale dimensions have emerged as possible label-free biological and chemical sensors capable of highly sensitive detection of various entities and processes. While significant progress has been made towards improving their sensitivity, much is yet to be explored in the study of various critical parameters, such as the choice of a sensing dielectric, the choice of applied front and back gate biases, the design of the device dimensions, and many others. In this work, we present a process to fabricate nanowire and nanoplate FETs with Al2O3 gate dielectrics and we compare these devices with FETs with SiO2 gate dielectrics. The use of a high-k dielectric such as Al2O3 allows for the physical thickness of the gate dielectric to be thicker without losing sensitivity to charge, which then reduces leakage currents and results in devices that are highly robust in fluid. This optimized process results in devices stable for up to 8 h in fluidic environments. Using pH sensing as a benchmark, we show the importance of optimizing the device bias, particularly the back gate bias which modulates the effective channel thickness. We also demonstrate that devices with Al2O3 gate dielectrics exhibit superior sensitivity to pH when compared to devices with SiO2 gate dielectrics. Finally, we show that when the effective electrical silicon channel thickness is on the order of the Debye length, device response to pH is virtually independent of device width. These silicon FET sensors could become integral components of future silicon based Lab on Chip systems. PMID:21203849

  4. Atomic-layer-deposited Al2O3-HfO2-Al2O3 dielectrics for metal-insulator-metal capacitor applications

    NASA Astrophysics Data System (ADS)

    Ding, Shi-Jin; Zhu, Chunxiang; Li, Ming-Fu; Zhang, David Wei

    2005-08-01

    Atomic-layer-deposited Al2O3-HfO2-Al2O3 dielectrics have been investigated to replace conventional silicon oxide and nitride for radio frequency and analog metal-insulator-metal capacitors applications. In the case of 1-nm-Al2O3, sufficiently good electrical performances are achieved, including a high dielectric constant of ˜17, a small dissipation factor of 0.018 at 100kHz, an extremely low leakage current of 7.8×10-9A/cm2 at 1MV/cm and 125°C, perfect voltage coefficients of capacitance (74ppm/V2 and 10ppm/V). The quadratic voltage coefficient of capacitance decreases with the applied frequency due to the change of relaxation time with different carrier mobility in insulator, and correlates with the dielectric composition and thickness, which is of intrinsic property owing to electric field polarization. Furthermore, the conduction mechanism of the AHA dielectrics is also discussed, indicating the Schottky emission dominated at room temperature.

  5. Low interfacial trap density and sub-nm equivalent oxide thickness in In0.53Ga0.47As (001) metal-oxide-semiconductor devices using molecular beam deposited HfO2/Al2O3 as gate dielectrics

    NASA Astrophysics Data System (ADS)

    Chu, L. K.; Merckling, C.; Alian, A.; Dekoster, J.; Kwo, J.; Hong, M.; Caymax, M.; Heyns, M.

    2011-07-01

    We investigated the passivation of In0.53Ga0.47As (001) surface by molecular beam epitaxy techniques. After growth of strained In0.53Ga0.47As on InP (001) substrate, HfO2/Al2O3 high-κ oxide stacks have been deposited in-situ after surface reconstruction engineering. Excellent capacitance-voltage characteristics have been demonstrated along with low gate leakage currents. The interfacial density of states (Dit) of the Al2O3/In0.53Ga0.47As interface have been revealed by conductance measurement, indicating a downward Dit profile from the energy close to the valence band (medium 1012 cm-2eV-1) towards that close to the conduction band (1011 cm-2eV-1). The low Dit's are in good agreement with the high Fermi-level movement efficiency of greater than 80%. Moreover, excellent scalability of the HfO2 has been demonstrated as evidenced by the good dependence of capacitance oxide thickness on the HfO2 thickness (dielectric constant of HfO2 ˜20) and the remained low Dit's due to the thin Al2O3 passivation layer. The sample with HfO2 (3.4 nm)/Al2O3 (1.2 nm) as the gate dielectrics has exhibited an equivalent oxide thickness of ˜0.93 nm.

  6. Vacuum ultraviolet photochemical selective area atomic layer deposition of Al2O3 dielectrics

    NASA Astrophysics Data System (ADS)

    Chalker, P. R.; Marshall, P. A.; Dawson, K.; Brunell, I. F.; Sutcliffe, C. J.; Potter, R. J.

    2015-01-01

    We report the photochemical atomic layer deposition of Al2O3 thin films and the use of this process to achieve area-selective film deposition. A shuttered vacuum ultraviolet (VUV) light source is used to excite molecular oxygen and trimethyl aluminum to deposit films at 60°C. In-situ QCM and post-deposition ellipsometric measurements both show that the deposition rate is saturative as a function of irradiation time. Selective area deposition was achieved by projecting the VUV light through a metalized magnesium fluoride photolithographic mask and the selectivity of deposition on the illuminated and masked regions of the substrate is a logarithmic function of the UV exposure time. The Al2O3 films exhibit dielectric constants of 8 - 10 at 1 MHz after forming gas annealing, similar to films deposited by conventional thermal ALD.

  7. FAST TRACK COMMUNICATION High mobility and low operating voltage ZnGaO and ZnGaLiO transistors with spin-coated Al2O3 as gate dielectric

    NASA Astrophysics Data System (ADS)

    Xia, D. X.; Xu, J. B.

    2010-11-01

    Spin-coated alumina serving as a gate dielectric in thin film transistors shows interesting dielectric properties for low-voltage applications, despite a moderate capacitance. With Ga singly doped and Ga, Li co-doped ZnO as the active channel layers, typical mobilities of 4.7 cm2 V-1 s-1 and 2.1 cm2 V-1 s-1 are achieved, respectively. At a given gate bias, the operation current is much smaller than the previously reported values in low-voltage thin film transistors, primarily relying on the giant-capacitive dielectric. The reported devices combine advantages of high mobility, low power consumption, low cost and ease of fabrication. In addition to the transparent nature of both the dielectric and semiconducting active channels, the superior electrical properties of the devices may provide a new avenue for future transparent electronics.

  8. Effects of γ-radiation on dielectric properties of LDPE-Al2O3 nanocomposites

    NASA Astrophysics Data System (ADS)

    Ciuprina, Florin; Zaharescu, Traian; Pleşa, Ilona

    2013-03-01

    Until now several methods for processing and characterization have been tested, and some theories and models have been proposed for these materials having a huge nanofiller-polymer interface area which seems to be the main responsible for their unique properties. The accelerated testing by irradiation of LDPE has been extensively studied in order to assess optimized formulation. The present paper characterizes LDPE modified with Al2O3 nanoparticles. The dispersed nanofiller was added in various concentrations (2, 5 and 10 wt%). The accelerated aging under γ-irradiation was accomplished for evaluation of material behavior to hard stressing environment. Dielectric properties (real part of the permittivity and tan delta) and oxidation resistance were discussed. An improvement of the dielectric losses is noticed for the tested nanocomposites at a radiation dose up to 20 kGy. The radiochemical stability studied by chemiluminescence provides satisfactory stability in the correlation with slight modification of basis polymer due to the inert feature of filler.

  9. Microwave dielectric properties of CaCu3Ti4O12-Al2O3 composite

    NASA Astrophysics Data System (ADS)

    Rahman, Mohd Fariz Ab; Abu, Mohamad Johari; Karim, Saniah Ab; Zaman, Rosyaini Afindi; Ain, Mohd Fadzil; Ahmad, Zainal Arifin; Mohamed, Julie Juliewatty

    2016-07-01

    (1-x)CaCu3Ti4O12 + (x)Al2O3 composite (0 ≤ x ≤0.25) was prepared via conventional solid-state reaction method. The fabrication of sample was started with synthesizing stoichiometric CCTO from CaCO3, CuO and TiO2 powders, then wet-mixed in deionized water for 24 h. The process was continued with calcined CCTO powder at 900 °C for 12 h before sintered at 1040 °C for 10 h. Next, the calcined CCTO powder with different amount of Al2O3 were mixed for 24 h, then palletized and sintered at 1040 °C for 10. X-ray diffraction analysis on the sintered samples showed that CCTO powder was in a single phase, meanwhile the trace of secondary peaks which belong to CaAl2O4 and Corundum (Al2O3) could be observed in the other samples Scanning electron microscopy analysis showed that the grain size of the sample is firstly increased with addition of Al2O3 (x = 0.01), then become smaller with the x > 0.01. Microwave dielectric properties showed that the addition of Al2O3 (x = 0.01) was remarkably reduced the dielectric loss while slightly increased the dielectric permittivity. However, further addition of Al2O3 was reduced both dielectric loss and permittivity at least for an order of magnitude.

  10. Enhanced Dielectric Properties and High-Temperature Microwave Absorption Performance of Zn-Doped Al2O3 Ceramic

    NASA Astrophysics Data System (ADS)

    Wang, Yuan; Luo, Fa; Wei, Ping; Zhou, Wancheng; Zhu, Dongmei

    2015-07-01

    To improve the dielectric and microwave absorption properties of Al2O3 ceramic, Zn-doped Al2O3 ceramic was prepared by conventional ceramic processing. X-ray diffraction analysis confirmed that Zn atoms successfully entered the Al2O3 ceramic lattice and occupied Al sites. The complex permittivity increased with increasing Zn concentration, which is mainly attributed to the increase in charged vacancy defects and densification of the Al2O3 ceramic. In addition, the temperature-dependent complex permittivity of 3% Zn-doped Al2O3 ceramic was determined in the temperature range from 298 K to 873 K. Both the real and imaginary parts of the complex permittivity increased monotonically with increasing temperature, which can be ascribed to the shortened relaxation time and increasing electrical conductivity. The increased complex permittivity leads to a great improvement in microwave absorption. In particular, when the temperature is up to 873 K, the 3% Zn-doped Al2O3 ceramic exhibited the best absorption performance with a maximum peak (-12.1 dB) and broad effective absorption bandwidth (reflection loss less than -10 dB from 9.3 GHz to 12.3 GHz). These results reveal that Zn-doped Al2O3 ceramic is a promising candidate for use as a kind of high-temperature microwave absorption material.

  11. Critical behaviors of the conductivity and dielectric constant of Ti3SiC2/Al2O3 hybrids

    NASA Astrophysics Data System (ADS)

    Wu, Rui-Fen; Pan, Wei; Shi, Sui-Lin; Han, Ruo-Bing

    2007-09-01

    Ti3SiC2/Al2O3 hybrids were prepared by a spark plasma sintering process. The effective dc conductivity of the hybrids was measured at room temperature, which agrees with the percolation theory and follows the power law around the percolation threshold. The ac conductivity and dielectric constants of the hybrids were also characterized and follow the power law when the concentration of the conductive phase is close to the percolation threshold; meanwhile, the dielectric constant could increase over three orders of magnitude compared with Al2O3.

  12. Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics

    NASA Astrophysics Data System (ADS)

    Zhu, Jie-Jie; Ma, Xiao-Hua; Chen, Wei-Wei; Hou, Bin; Xie, Yong; Hao, Yue

    2016-05-01

    In this paper, the interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor (MIS) heterostructures with AlN, Al2O3, and Al2O3/AlN laminated dielectrics were studied. In situ plasma pretreatment resulted negligible interface trap states and voltage hysteresis. The fixed charge density at Al2O3/AlN (or Al2O3/barrier) interface was estimated to be 1.66 × 1013 cm-2 by using flat-band voltage shift, and the oxide bulk charge concentration was 2.86 × 1017 cm-3. The interface charge density at other interfaces were at the order of 1011 cm-2. Simulation results using the above charge density/concentration indicated that Al2O3/AlN interface fixed charges dominated the dielectric-related voltage shift in AlGaN/GaN MIS heterostructures, which caused a large voltage shift of -3 V with 10 nm Al2O3 thickness, while the flat-band voltage variety resulting from other types of charges was within 0.1 V.

  13. A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs

    NASA Astrophysics Data System (ADS)

    Krylov, Igor; Pokroy, Boaz; Ritter, Dan; Eizenberg, Moshe

    2016-02-01

    Thermal activated atomic layer deposited (t) (ALD) and plasma enhanced (p) ALD (PEALD) AlN films were investigated for gate applications of InGaAs based metal-insulator-semiconductor devices and compared to the well-known Al2O3 based system. The roles of post-metallization annealing (PMA) and the pre-deposition treatment (PDT) by either trimethylaluminium (TMA) or NH3 were studied. In contrast to the case of Al2O3, in the case of AlN, the annealing temperature reduced interface states density. In addition, improvement of the AlN film stoichiometry and a related border traps density reduction were observed following PMA. The lowest interface states density (among the investigated gate stacks) was found for PEALD AlN/InGaAs stacks after TMA PDT. At the same time, higher values of the dispersion in accumulation were observed for AlN/InGaAs gate stacks compared to those with Al2O3 dielectric. No indium out-diffusion and the related leakage current degradation due to annealing were observed at the AlN/InGaAs stack. In light of these findings, we conclude that AlN is a promising material for InGaAs based gate stack applications.

  14. Fermi level pinning in metal/Al2O3/InGaAs gate stack after post metallization annealing

    NASA Astrophysics Data System (ADS)

    Winter, R.; Krylov, I.; Cytermann, C.; Tang, K.; Ahn, J.; McIntyre, P. C.; Eizenberg, M.

    2015-08-01

    The effect of post metal deposition annealing on the effective work function in metal/Al2O3/InGaAs gate stacks was investigated. The effective work functions of different metal gates (Al, Au, and Pt) were measured. Flat band voltage shifts for these and other metals studied suggest that their Fermi levels become pinned after the post-metallization vacuum annealing. Moreover, there is a difference between the measured effective work functions of Al and Pt, and the reported vacuum work function of these metals after annealing. We propose that this phenomenon is caused by charging of indium and gallium induced traps at the annealed metal/Al2O3 interface.

  15. Comparison of Multilayer Dielectric Thin Films for Future Metal-Insulator-Metal Capacitors: Al2O3/HfO2/Al2O3 versus SiO2/HfO2/SiO2

    NASA Astrophysics Data System (ADS)

    Park, Sang-Uk; Kwon, Hyuk-Min; Han, In-Shik; Jung, Yi-Jung; Kwak, Ho-Young; Choi, Woon-Il; Ha, Man-Lyun; Lee, Ju-Il; Kang, Chang-Yong; Lee, Byoung-Hun; Jammy, Raj; Lee, Hi-Deok

    2011-10-01

    In this paper, two kinds of multilayered metal-insulator-metal (MIM) capacitors using Al2O3/HfO2/Al2O3 (AHA) and SiO2/HfO2/SiO2 (SHS) were fabricated and characterized for radio frequency (RF) and analog mixed signal (AMS) applications. The experimental results indicate that the AHA MIM capacitor (8.0 fF/µm2) is able to provide a higher capacitance density than the SHS MIM capacitor (5.1 fF/µm2), while maintaining a low leakage current of about 50 nA/cm2 at 1 V. The quadratic voltage coefficient of capacitance, α gradually decreases as a function of stress time under constant voltage stress (CVS). The parameter variation of SHS MIM capacitors is smaller than that of AHA MIM capacitors. The effects of CVS on voltage linearity and time-dependent dielectric breakdown (TDDB) characteristics were also investigated.

  16. Microwave Dielectric Resonance and Negative Permittivity Behavior in Al2O3-CuO-Cu Nanocomposites

    NASA Astrophysics Data System (ADS)

    Calame, Jeffrey; Battat, Jacob

    2006-03-01

    The frequency-dependent microwave (0.1-18 GHz) complex permittivity of nanocomposites based on the Al2O3/CuO/Cu system is investigated. The composites are formed by solution infusion of copper precursors into a porous Al2O3 matrix, followed by thermal decomposition to copper oxides and localized formation of CuAl2O4 spinels, and finally partial reduction by H2 firing. The final material has a complicated microstructure and exhibits strong amplitude, relatively narrowband dielectric resonance in the microwave regime at intermediate concentrations (˜15-18% by volume) of Cu. The resonances are superficially similar in structure to plasmon and Reststrahlen resonances typically seen in conductors at far-infrared to optical frequencies, but occurring at much lower frequencies in the composites. This is in contrast to the usual broadband induced-polarization dielectric relaxations observed in standard composites. Large concentrations of copper cause negative permittivity behavior below 6 GHz. Permittivity data, SEM micrographs, and possible explanations will be presented.

  17. Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Ma, Zhongyuan; Wang, Wen; Yang, Huafeng; Jiang, Xiaofan; Yu, Jie; Qin, Hua; Xu, Ling; Chen, Kunji; Huang, Xinfan; Li, Wei; Xu, Jun; Feng, Duan

    2016-02-01

    The down-scaling of nanocrystal Si (nc-Si) floating gate memory must overcome the challenge of leakage current induced by the conventional ultra-thin tunnel layer. We demonstrate that an improved memory performance based on the Al/SiNx/nc-Si/Al2O3/Si structure can be achieved by adopting the Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition. A larger memory window of 7.9 V and better retention characteristics of 4.7 V after 105 s can be obtained compared with the devices containing a conventional SiO2 tunnel layer of equivalent thickness. The capacitance-voltage characteristic reveals that the Al2O3 tunnel layer has a smaller electron barrier height, which ensures that more electrons are injected into the nc-Si dots through the Al2O3/Si interface. The analysis of the conductance-voltage and high-resolution cross-section transmission microscopy reveals that the smaller nc-Si dots dominate in the charge injection in the nc-Si floating gate MOS device with an Al2O3 tunnel layer. With an increase of the nc-Si size, both nc-Si and the interface contribute to the charge storage capacity and retention. The introduction of the Al2O3 tunnel layer in nc-Si floating gate memory provides a method to achieve an improved performance of nc-Si floating gate memory.

  18. Characterization of Damage of Al2O3/Ge Gate Stack Structure Induced with Light Radiation during Plasma Nitridation

    NASA Astrophysics Data System (ADS)

    Kusumandari; Takeuchi, Wakana; Kato, Kimihiko; Shibayama, Shigehisa; Sakashita, Mitsuo; Nakatsuka, Osamu; Zaima, Shigeaki

    2012-01-01

    We have investigated the effects of light radiation during plasma nitridation on the electrical properties of an Al2O3/Ge gate stack structure using the pallet for plasma evaluation (PAPE) technique. From the capacitance-voltage characteristics, the flatband voltage shift due to fixed oxide charges significantly increases after light exposure with an energy higher than 7.5 eV. In addition, the density of trapped charges near the interface and the interface state density (Dit) also significantly increase after light exposure with an energy over 11.3 eV. The net density of positive fixed oxide charges, the density of trapped charges near the interface, and Dit can be reduced by post-metallization annealing (PMA) in N2 ambient at 300 °C.

  19. Remarkable charge-trapping efficiency of the memory device with (TiO2)0.8(Al2O3)0.1 composite charge-storage dielectric

    NASA Astrophysics Data System (ADS)

    Jiang, K.; Ou, X.; Lan, X. X.; Cao, Z. Y.; Liu, X. J.; Lu, W.; Gong, C. J.; Xu, B.; Li, A. D.; Xia, Y. D.; Yin, J.; Liu, Z. G.

    2014-06-01

    A memory device p-Si/SiO2/(TiO2)0.8(Al2O3)0.1(TAO-81)/Al2O3/Pt was fabricated, in which a composite of two high-k dielectrics with a thickness of 1 nm was employed as the charge-trapping layer to enhance the charge-trapping efficiency of the memory device. At an applied gate voltage of ±9 V, TAO-81 memory device shows a memory window of 8.83 V in its C-V curve. It also shows a fast response to a short voltage pulse of 10-5 s. The charge-trapping capability, the endurance, and retention characteristics of TAO-81 memory device can be improved by introducing double TAO-81 charge-trapping layers intercalated by an Al2O3 layer. The charge-trapping mechanism in the memory device is mainly ascribed to the generation of the electron-occupied defect level in the band gap of Al2O3 induced by the inter-diffusion between TiO2 and Al2O3.

  20. Electrically programmable-erasable In-Ga-Zn-O thin-film transistor memory with atomic-layer-deposited Al2O3/Pt nanocrystals/Al2O3 gate stack

    NASA Astrophysics Data System (ADS)

    Qian, Shi-Bing; Zhang, Wen-Peng; Liu, Wen-Jun; Ding, Shi-Jin

    2015-12-01

    Amorphous indium-gallium-zinc oxide (a-IGZO) thin-film transistor (TFT) memory is very promising for transparent and flexible system-on-panel displays; however, electrical erasability has always been a severe challenge for this memory. In this article, we demonstrated successfully an electrically programmable-erasable memory with atomic-layer-deposited Al2O3/Pt nanocrystals/Al2O3 gate stack under a maximal processing temperature of 300 oC. As the programming voltage was enhanced from 14 to 19 V for a constant pulse of 0.2 ms, the threshold voltage shift increased significantly from 0.89 to 4.67 V. When the programmed device was subjected to an appropriate pulse under negative gate bias, it could return to the original state with a superior erasing efficiency. The above phenomena could be attributed to Fowler-Nordheim tunnelling of electrons from the IGZO channel to the Pt nanocrystals during programming, and inverse tunnelling of the trapped electrons during erasing. In terms of 0.2-ms programming at 16 V and 350-ms erasing at -17 V, a large memory window of 3.03 V was achieved successfully. Furthermore, the memory exhibited stable repeated programming/erasing (P/E) characteristics and good data retention, i.e., for 2-ms programming at 14 V and 250-ms erasing at -14 V, a memory window of 2.08 V was still maintained after 103 P/E cycles, and a memory window of 1.1 V was retained after 105 s retention time.

  1. Dielectric behavior and ac conductivity study of NiO /Al2O3 nanocomposites in humid atmosphere

    NASA Astrophysics Data System (ADS)

    Ahmad, Mohamad M.; Makhlouf, Salah A.; Khalil, Kamal M. S.

    2006-11-01

    Humidity sensing characteristics of NiO /Al2O3 nanocomposites, prepared by sol-gel method, are studied by impedance spectroscopy. Modeling of the obtained impedance spectra with an appropriate equivalent circuit enables us to separate the electrical responses of the tightly bound chemisorbed water molecules on the grain surfaces and the loosely associated physisorbed water layers. Dependence of the dielectric properties and ac conductivity of the nanocomposites on relative humidity (RH) were studied as a function of the frequency of the applied ac signal in the frequency range of 0.1-105Hz. The electrical relaxation behavior of the investigated materials is presented in the conductivity formalism, where the conductivity spectra at different RHs are analyzed by the Almond-West formalism [D. P. Almond et al., Solid State Ionics 8, 159 (1983)]. The dc conductivity and the hopping rate of charge carriers, determined from this analysis, show similar dependences on RH, indicating that the concentration of mobile ions is independent of RH and is primarily determined by the chemisorption process of water molecules. Finally, the results are discussed in view of a percolation-type conduction mechanism, where mobile ions are provided by the chemisorbed water molecules and the percolation network is formed by the physisorbed water layers.

  2. Dielectric properties of Al2O3 coatings deposited via atmospheric plasma spraying and dry-ice blasting correlated with microstructural characteristics

    NASA Astrophysics Data System (ADS)

    Dong, Shujuan; Song, Bo; Liao, Hanlin; Coddet, Christian

    2015-01-01

    In this work, atmospheric plasma spraying combined with dry-ice blasting have been used to prepare alumina (Al2O3) coatings designed for insulating applications. The microstructural characteristics and dielectric properties of Al2O3 coatings were presented. The electrical insulating properties, i.e., dielectric strength and breakdown voltage, were investigated by dielectric breakdown test using direct current and alternating current. Relationships between dielectric properties and coating characteristics were discussed. The results showed that dry-ice blasting used during atmospheric plasma spray process allowed the production of coatings with better dielectric properties than those prepared without dry-ice blasting. The dielectric properties were correlated with the microstructural characteristics, not with phase composition.

  3. Control of threshold voltage in E-mode and D-mode GaN-on-Si metal-insulator-semiconductor heterostructure field effect transistors by in-situ fluorine doping of atomic layer deposition Al2O3 gate dielectrics

    NASA Astrophysics Data System (ADS)

    Roberts, J. W.; Chalker, P. R.; Lee, K. B.; Houston, P. A.; Cho, S. J.; Thayne, I. G.; Guiney, I.; Wallis, D.; Humphreys, C. J.

    2016-02-01

    We report the modification and control of threshold voltage in enhancement and depletion mode AlGaN/GaN metal-insulator-semiconductor heterostructure field effect transistors through the use of in-situ fluorine doping of atomic layer deposition Al2O3. Uniform distribution of F ions throughout the oxide thickness are achievable, with a doping level of up to 5.5 × 1019 cm-3 as quantified by secondary ion mass spectrometry. This fluorine doping level reduces capacitive hysteretic effects when exploited in GaN metal-oxide-semiconductor capacitors. The fluorine doping and forming gas anneal also induces an average positive threshold voltage shift of between 0.75 and 1.36 V in both enhancement mode and depletion mode GaN-based transistors compared with the undoped gate oxide via a reduction of positive fixed charge in the gate oxide from +4.67 × 1012 cm-2 to -6.60 × 1012 cm-2. The application of this process in GaN based power transistors advances the realisation of normally off, high power, high speed devices.

  4. InP MOS capacitor and E-mode n-channel FET with ALD Al2O3-based high- k dielectric

    NASA Astrophysics Data System (ADS)

    Yen, Chih-Feng; Yeh, Min-Yen; Chong, Kwok-Keung; Hsu, Chun-Fa; Lee, Ming-Kwei

    2016-07-01

    The electrical characteristics of atomic-layer-deposited Al2O3/TiO2/Al2O3 on (NH4)2S-treated InP MOS capacitor and related MOSFET were studied. The electrical characteristics were improved from the reduction of native oxides and sulfur passivation on InP by (NH4)2S treatment. The high bandgap Al2O3 on TiO2 can reduce the thermionic emission, and the Al2O3 under TiO2 improves the interface-state density by self-cleaning. The high dielectric constant TiO2 is used to lower the equivalent oxide thickness. The leakage currents can reach 2.3 × 10-8 and 2.2 × 10-7 A/cm2 at ±2 MV/cm, respectively. The lowest interface-state density is 4.6 × 1011 cm-2 eV-1 with a low-frequency dispersion of 15 %. The fabricated enhancement-mode n-channel sulfur-treated InP MOSFET exhibits good electrical characteristics with a maximum transconductance of 146 mS/mm and effective mobility of 1760 cm2/V s. The subthreshold swing and threshold voltage are 117 mV/decade and 0.44 V, respectively.

  5. Temperature- and frequency-dependent dielectric behaviors of insulator/semiconductor (Al2O3/ZnO) nanolaminates with various ZnO thicknesses

    NASA Astrophysics Data System (ADS)

    Li, Jin; Bi, Xiaofang

    2016-07-01

    Al2O3/ZnO nanolaminates (NLs) with various ZnO sublayer thicknesses were prepared by atomic layer deposition. The Al2O3 sublayers are characterized as amorphous and the ZnO sublayers have an oriented polycrystalline structure. As the ZnO thickness decreases to a certain value, each NL exhibits a critical temperature at which its dielectric constant starts to rise quickly. Moreover, this temperature increases as the ZnO thickness is decreased further. On the other hand, the permittivity demonstrates a large value of several hundred at a frequency  ⩽1000 Hz, followed by a steplike decrease at a higher frequency. The change in the cut-off frequency with ZnO thickness is characterized by a hook function. It is revealed that the Coulomb confinement effect becomes predominant in the dielectric behaviors of the NLs with very thin ZnO. As the ZnO thickness decreases to about the same as or even smaller than the Bohr radius of ZnO, a great change in the carrier concentration and effective mass of ZnO is induced, which is shown to be responsible for the peculiar dielectric behaviors of Al2O3/ZnO with very thin ZnO. These findings provide insight into the prevailing mechanisms to optimize the dielectric properties of semiconductor/insulator laminates with nanoscale sublayer thickness.

  6. Excellent passivation of highly doped p-type Si surfaces by the negative-charge-dielectric Al2O3

    NASA Astrophysics Data System (ADS)

    Hoex, B.; Schmidt, J.; Bock, R.; Altermatt, P. P.; van de Sanden, M. C. M.; Kessels, W. M. M.

    2007-09-01

    From lifetime measurements, including a direct experimental comparison with thermal SiO2, a-Si :H, and as-deposited a-SiNx:H, it is demonstrated that Al2O3 provides an excellent level of surface passivation on highly B-doped c-Si with doping concentrations around 1019cm-3. The Al2O3 films, synthesized by plasma-assisted atomic layer deposition and with a high fixed negative charge density, limit the emitter saturation current density of B-diffused p +-emitters to ˜10 and ˜30fA/cm2 on >100 and 54Ω/sq sheet resistance p+-emitters, respectively. These results demonstrate that highly doped p-type Si surfaces can be passivated as effectively as highly doped n-type surfaces.

  7. Nanoclusters of MoO3-x embedded in an Al2O3 matrix engineered for customizable mesoscale resistivity and high dielectric strength

    NASA Astrophysics Data System (ADS)

    Tong, William M.; Brodie, Alan D.; Mane, Anil U.; Sun, Fuge; Kidwingira, Françoise; McCord, Mark A.; Bevis, Christopher F.; Elam, Jeffrey W.

    2013-06-01

    We have synthesized a material consisting of conducting metal oxide (MoO3-x) nanoclusters embedded in a high-dielectric-strength insulator (Al2O3) matrix. The resistivity of this material can be customized by varying the concentration of the MoO3-x nanoclusters. The Al2O3 protects the MoO3-x from stoichiometry change, thus conserving the number of carriers and maintaining a high dielectric strength. This composite material is grown by atomic layer deposition, a thin film deposition technique suitable for coating 3D structures. We applied these atomic layer deposition composite films to our 3D electron-optical micro electrical mechanical systems devices and greatly improved their performance.

  8. Electronic properties of ultrathin HfO2, Al2O3, and Hf-Al-O dielectric films on Si(100) studied by quantitative analysis of reflection electron energy loss spectra

    NASA Astrophysics Data System (ADS)

    Jin, Hua; Oh, Suhk Kun; Kang, Hee Jae; Tougaard, Sven

    2006-10-01

    Quantitative analysis of reflection electron energy loss spectra for ultrathin HfO2, Al2O3, and Hf-Al-O dielectric thin films on Si(100) were carried out by using Tougaard-Yubero [Surf. Interface Anal. 36, 824 (2004)] QUEELS-ɛ(k ,ω)-REELS software. Experimental cross sections obtained from reflection electron energy loss spectroscopy were compared with theoretical inelastic scattering cross section Ksc deduced from the simulated energy loss function (ELF). The ELF is expressed as a sum of Drude oscillators. For HfO2, the ELF shows peaks in the vicinity of 10, 17, 22, 27, 37, and 47eV. For Al2O3, a broad peak at 22eV with a very weak shoulder at 14eV and a shoulder at 32eV were observed, while for the Al2O3 doped HfO2, the peak position is similar to that of HfO2. This indicates that when Hf-Al-O film is used as a gate dielectric in a complementary metal-oxide semiconductor transistor, its electronic structure is mainly determined by the d state of Hf. In addition, the inelastic mean free path (IMFP) was also calculated from the theoretical inelastic scattering cross section. The IMFPs at 300eV were about 7.05, 9.62, and 8.48Å and those at 500eV were 11.42, 15.40, and 13.64Å for HfO2, Al2O3, and Hf-Al-O, respectively. The method of determining the IMFP from the ELF is a convenient tool for ultrathin dielectric materials.

  9. Atomic-layer-deposited Al2O3-HfO2 laminated and sandwiched dielectrics for metal insulator metal capacitors

    NASA Astrophysics Data System (ADS)

    Ding, Shi-Jin; Zhang, David Wei; Wang, Li-Kang

    2007-02-01

    Metal-insulator-metal (MIM) capacitors with atomic-layer-deposited Al2O3-HfO2 laminated and sandwiched dielectrics have been fabricated and electrically compared for analog circuit applications. The experimental results indicate that the laminated dielectrics exhibit much better leakage and breakdown characteristics than the sandwiched ones while maintaining higher capacitance densities and acceptable voltage linearity. In respect of the 1 nm Al2O3 and 10 nm HfO2 laminated dielectric, the resulting capacitor offers an extremely low leakage current of 2.4 × 10-9 A cm-2 at 8 V and a breakdown electric field of ~3.3 MV cm-1 at 125 °C together with a capacitance density of ~3.1 fF µm-2 and voltage coefficients of capacitance of 100 ppm V-2 and -80 ppm V-1 at 100 kHz. The superiority of the laminated dielectrics correlates with inhibition of HfO2 crystallization, discontinuity of the grain boundary channels from the top to the bottom and changes of the dielectric electronic properties due to the bonding and polarization effects at the multi-interfaces.

  10. A Study of the Dielectric Properties of Al2O3-TiO2 Composite in the Microwave and RF Regions

    NASA Astrophysics Data System (ADS)

    Campos, R. V. B.; Bezerra, C. L.; Oliveira, L. N. L.; Gouveia, D. X.; Silva, M. A. S.; Sombra, A. S. B.

    2015-11-01

    We have studied the effect of addition of titania, as a sintering agent, to alumina on the dielectric characteristics of the ceramic composites obtained. The dielectric properties of the titania-alumina composites were studied by use of impedance spectroscopy and the Hakki-Coleman method in the radio-frequency and microwave regions, respectively. The temperature coefficient of the resonant frequency ( τ f ) was also studied. Dielectric permittivity ( ɛ') was increased and the dielectric loss (tan δ) was improved by addition of titania, as a result of better sintering; addition of 10 wt.% titania resulted in ɛ' = 12.68 and tan δ = 8.23 × 10-4 in the microwave region. Increasing the concentration of TiO2 led to inversion of the τ f signal; values were positive when the concentration of TiO2 was >7.5 wt.%. The ceramic composites were evaluated as antennas; for all samples the return loss ( S 11) was <-10 dB and the gain was approximately 3 dBi. Addition of 7.5 wt.% titania to the Al2O3 improved antenna performance. In conclusion, addition of the TiO2 to alumina improves its dielectric properties, resulting in the possibility of use of such composites as dielectric resonator antennas (DRA).

  11. Electrical properties of GaAs metal-oxide-semiconductor structure comprising Al2O3 gate oxide and AlN passivation layer fabricated in situ using a metal-organic vapor deposition/atomic layer deposition hybrid system

    NASA Astrophysics Data System (ADS)

    Aoki, Takeshi; Fukuhara, Noboru; Osada, Takenori; Sazawa, Hiroyuki; Hata, Masahiko; Inoue, Takayuki

    2015-08-01

    This paper presents a compressive study on the fabrication and optimization of GaAs metal-oxide-semiconductor (MOS) structures comprising a Al2O3 gate oxide, deposited via atomic layer deposition (ALD), with an AlN interfacial passivation layer prepared in situ via metal-organic chemical vapor deposition (MOCVD). The established protocol afforded self-limiting growth of Al2O3 in the atmospheric MOCVD reactor. Consequently, this enabled successive growth of MOCVD-formed AlN and ALD-formed Al2O3 layers on the GaAs substrate. The effects of AlN thickness, post-deposition anneal (PDA) conditions, and crystal orientation of the GaAs substrate on the electrical properties of the resulting MOS capacitors were investigated. Thin AlN passivation layers afforded incorporation of optimum amounts of nitrogen, leading to good capacitance-voltage (C-V) characteristics with reduced frequency dispersion. In contrast, excessively thick AlN passivation layers degraded the interface, thereby increasing the interfacial density of states (Dit) near the midgap and reducing the conduction band offset. To further improve the interface with the thin AlN passivation layers, the PDA conditions were optimized. Using wet nitrogen at 600 °C was effective to reduce Dit to below 2 × 1012 cm-2 eV-1. Using a (111)A substrate was also effective in reducing the frequency dispersion of accumulation capacitance, thus suggesting the suppression of traps in GaAs located near the dielectric/GaAs interface. The current findings suggest that using an atmosphere ALD process with in situ AlN passivation using the current MOCVD system could be an efficient solution to improving GaAs MOS interfaces.

  12. Comparative study of the electrical and dielectric properties of PVA-PEG-Al 2O 3-MI (M=Na, K, Ag) complex polymer electrolytes

    NASA Astrophysics Data System (ADS)

    Prajapati, G. K.; Gupta, P. N.

    2011-08-01

    Plasticized nanocomposite polymer electrolytes (PNCPEs) based on poly(vinyl alcohol) (PVA)-MI (M=Na, K, Ag) dispersed with nanofillers Al 2O 3 and plasticized with poly(ethylene glycol) (PEG) have been prepared by solution cast technique. The structural properties of the samples have been characterized using various experimental techniques such as XRD, DSC, FTIR and B-G spectroscopy. The ionic conductivity and dielectric constant of the samples have been estimated using a LCZ meter in a wide temperature range, i.e. from 30 to 170 °C. It has been observed that the presence of water molecules in polymer electrolytes significantly affects the mobility of ionic species. The temperature dependent ionic conductivity shows the Arrhenius type behavior separated in three distinct regions. The ionic transference number for all PNCPE samples is found to be ≈1, which strongly suggests their ionic nature.

  13. Leakage Current Mechanism of InN-Based Metal-Insulator-Semiconductor Structures with Al2O3 as Dielectric Layers.

    PubMed

    Wang, X; Zhang, G Z; Xu, Y; Gan, X W; Chen, C; Wang, Z; Wang, Y; Wang, J L; Wang, T; Wu, H; Liu, C

    2016-12-01

    InN-based metal-insulator-semiconductor (MIS) structures were prepared with Al2O3 as the gate oxides. Surface morphologies of InN films are improved with increasing Mg doping concentrations. At high frequencies, the measured capacitance densities deviate from the real ones with turning frequencies inversely proportional to series resistances. An ultralow leakage current density of 1.35 × 10(-9) A/cm(2) at 1 V is obtained. Fowler-Nordheim tunneling is the main mechanism of the leakage current at high fields, while Schottky emission dominates at low fields. Capacitance densities shift with different biases, indicating that the InN-based MIS structures can serve as potential candidates for MIS field-effect transistors. PMID:26759357

  14. Leakage Current Mechanism of InN-Based Metal-Insulator-Semiconductor Structures with Al2O3 as Dielectric Layers

    NASA Astrophysics Data System (ADS)

    Wang, X.; Zhang, G. Z.; Xu, Y.; Gan, X. W.; Chen, C.; Wang, Z.; Wang, Y.; Wang, J. L.; Wang, T.; Wu, H.; Liu, C.

    2016-01-01

    InN-based metal-insulator-semiconductor (MIS) structures were prepared with Al2O3 as the gate oxides. Surface morphologies of InN films are improved with increasing Mg doping concentrations. At high frequencies, the measured capacitance densities deviate from the real ones with turning frequencies inversely proportional to series resistances. An ultralow leakage current density of 1.35 × 10-9 A/cm2 at 1 V is obtained. Fowler-Nordheim tunneling is the main mechanism of the leakage current at high fields, while Schottky emission dominates at low fields. Capacitance densities shift with different biases, indicating that the InN-based MIS structures can serve as potential candidates for MIS field-effect transistors.

  15. Microstructure and dielectric properties of (Ba 0.6Sr 0.4)TiO 3 thin films grown on super smooth glazed-Al 2O 3 ceramics substrate

    NASA Astrophysics Data System (ADS)

    Chen, Hongwei; Yang, Chuanren; Zheng, Shanxue; Zhang, Jihua; Zhang, Qiaozhen; Lei, Guanhuan; Lou, Feizhi; Yang, Lijun

    2011-12-01

    Modified substrates with nanometer scale smooth surface were obtained via coating a layer of CaO-Al2O3-SiO2 (CaAlSi) high temperature glaze with proper additives on the rough-95% Al2O3 ceramics substrates. (Ba0.6Sr0.4)TiO3 (BST) thin films were deposited on modified Al2O3 substrates by radio-frequency magnetron sputtering. The microstructure, dielectric, and insulating properties of BST thin films grown on glazed-Al2O3 substrates were investigated by X-ray diffraction (XRD), atomic force microscope (AFM), and dielectric properties measurement. These results showed that microstructure and dielectric properties of BST thin films grown on glazed-Al2O3 substrates were almost consistent with that of BST thin films grown on LaAlO3 (1 0 0) single-crystal substrates. Thus, the expensive single-crystal substrates may be substituted by extremely cheap glazed-Al2O3 substrates.

  16. “Thermal Stabilization Effect” of Al2O3 nano-dopants improves the high-temperature dielectric performance of polyimide

    NASA Astrophysics Data System (ADS)

    Yang, Yang; He, Jinliang; Wu, Guangning; Hu, Jun

    2015-11-01

    Insulation performance of the dielectrics under extreme conditions always attracts widespread attention in electrical and electronic field. How to improve the high-temperature dielectric properties of insulation materials is one of the key issues in insulation system design of electrical devices. This paper studies the temperature-dependent corona resistance of polyimide (PI)/Al2O3 nanocomposite films under high-frequency square-wave pulse conditions. Extended corona resistant lifetime under high-temperature conditions is experimentally observed in the 2 wt% nanocomposite samples. The “thermal stabilization effect” is proposed to explain this phenomenon which attributes to a new kind of trap band caused by nanoparticles. This effect brings about superior space charge characteristics and corona resistance under high temperature with certain nano-doping concentration. The proposed theory is experimentally demonstrated by space charge analysis and thermally stimulated current (TSC) tests. This discovered effect is of profound significance on improving high-temperature dielectric properties of nanocomposites towards various applications.

  17. “Thermal Stabilization Effect” of Al2O3 nano-dopants improves the high-temperature dielectric performance of polyimide

    PubMed Central

    Yang, Yang; He, Jinliang; Wu, Guangning; Hu, Jun

    2015-01-01

    Insulation performance of the dielectrics under extreme conditions always attracts widespread attention in electrical and electronic field. How to improve the high-temperature dielectric properties of insulation materials is one of the key issues in insulation system design of electrical devices. This paper studies the temperature-dependent corona resistance of polyimide (PI)/Al2O3 nanocomposite films under high-frequency square-wave pulse conditions. Extended corona resistant lifetime under high-temperature conditions is experimentally observed in the 2 wt% nanocomposite samples. The “thermal stabilization effect” is proposed to explain this phenomenon which attributes to a new kind of trap band caused by nanoparticles. This effect brings about superior space charge characteristics and corona resistance under high temperature with certain nano-doping concentration. The proposed theory is experimentally demonstrated by space charge analysis and thermally stimulated current (TSC) tests. This discovered effect is of profound significance on improving high-temperature dielectric properties of nanocomposites towards various applications. PMID:26597981

  18. Instability investigation of In0.7Ga0.3As quantum-well MOSFETs with Al2O3 and Al2O3/HfO2

    NASA Astrophysics Data System (ADS)

    Kwon, Hyuk-Min; Kim, Do-Kywn; Lim, Sung-Kyu; Hwang, Hae-Chul; Son, Seung Woo; Park, Jung Ho; Park, Won-Sang; Kim, Jin Su; Shin, Chan-Soo; Park, Won-Kyu; Lee, Jung Hee; Kim, Taewoo; Kim, Dae-Hyun

    2016-07-01

    We present an instability investigation of In0.7Ga0.3As quantum-well (QW) metal-oxide-semiconductor field-effect-transistors (MOSFETs) on InP substrate with Al2O3 and Al2O3/HfO2 gate stacks. The device with bi-layer Al2O3/HfO2 gate stack exhibits larger shift in threshold-voltage (ΔVT) under a constant-voltage-stress condition (CVS), than one with single Al2O3 gate stack. At cryogenic temperature, the device with bi-layer Al2O3/HfO2 gate stack also induces worse hysteresis behavior than one with single Al2O3 gate stack. These are mainly attributed to more traps inside the HfO2 material, yielding a charge build-up inside the HfO2 gate dielectric. This strongly calls for a follow-up process to minimize those traps within the high-k dielectric layer and eventually to improve the reliability of InGaAs MOSFETs with HfO2-based high-k gate dielectric.

  19. Nanocomposite YCrO3/Al2O3: characterization of the core-shell, magnetic properties, and enhancement of dielectric properties.

    PubMed

    Durán, A; Tiznado, H; Romo-Herrera, J M; Domínguez, D; Escudero, R; Siqueiros, J M

    2014-05-19

    Multifuncionality in polycrystalline multiferroic ceramics can be improved using an advanced synthesis process. In this work, core-shell design is being proposed to enhance the transport properties of biferroic YCrO3. The atomic layer deposition (ALD) thin-film growth technique was used for the YCrO3/Al2O3 (Y@Al) nanocomposite fabrication. A continuous, amorphous, and uniform Al2O3 shell, a few nanometers thick, was obtained and characterized by X-ray photoelectron spectroscopy, X-ray diffraction, and high-resolution transmission electron microscopy. The transport properties of biferroic YCrO3 coated with 50, 500, and 1000 ALD cycles of insulating Al2O3 were investigated using magnetization and AC conductivity measurements. It is observed that the values of the magnetic coercive field and the magnetization are affected by the amorphous and partially crystallized Al2O3 shell. Additionally, the Y@Al nanocomposite experiments show a notorious decreasing in the loss tangent and the electrical conductivity. Accordingly, hysteresis loops in the polarization versus electric energy data confirm the decrease of the leakage current as a consequence of the Al2O3 shell acting as a barrier layer. The results shown here confirm that the core-shell architecture is a promising alternative for improvement of the magnetic and ferroelectric properties in bulk multiferroics. PMID:24811873

  20. Effect of proton irradiation dose on InAlN/GaN metal-oxide semiconductor high electron mobility transistors with Al2O3 gate oxide

    DOE PAGESBeta

    Ahn, Shihyun; Kim, Byung -Jae; Lin, Yi -Hsuan; Ren, Fan; Pearton, Stephen J.; Yang, Gwangseok; Kim, Jihyun; Kravchenko, Ivan I.

    2016-07-26

    The effects of proton irradiation on the dc performance of InAlN/GaN metal-oxide-semiconductor high electron mobility transistors (MOSHEMTs) with Al2O3 as the gate oxide were investigated. The InAlN/GaN MOSHEMTs were irradiated with doses ranging from 1×1013 to 1×1015cm–2 at a fixed energy of 5MeV. There was minimal damage induced in the two dimensional electron gas at the lowest irradiation dose with no measurable increase in sheet resistance, whereas a 9.7% increase of the sheet resistance was observed at the highest irradiation dose. By sharp contrast, all irradiation doses created more severe degradation in the Ohmic metal contacts, with increases of specificmore » contact resistance from 54% to 114% over the range of doses investigated. These resulted in source-drain current–voltage decreases ranging from 96 to 242 mA/mm over this dose range. The trap density determined from temperature dependent drain current subthreshold swing measurements increased from 1.6 × 1013 cm–2 V–1 for the reference MOSHEMTs to 6.7 × 1013 cm–2 V–1 for devices irradiated with the highest dose. In conclusion, the carrier removal rate was 1287 ± 64 cm–1, higher than the authors previously observed in AlGaN/GaN MOSHEMTs for the same proton energy and consistent with the lower average bond energy of the InAlN.« less

  1. Performance and carrier transport analysis of In0.7Ga0.3As quantum-well MOSFETs with Al2O3/HfO2 gate stack

    NASA Astrophysics Data System (ADS)

    Son, Seung-Woo; Park, Jung-Ho; Baek, Ji-Min; Kim, Jin Su; Kim, Do-Kywn; Shin, Seung Heon; Banerjee, S. K.; Lee, Jung-Hee; Kim, Tae-Woo; Kim, Dae-Hyun

    2016-09-01

    In this paper, we have fabricated and characterized In0.7Ga0.3As quantum-well (QW) metal-oxide-semiconductor field-effect-transistors (MOSFETs). We have employed the gate dielectric of the Al2O3/HfO2 (0.6/2 nm) bi-layer stack by ALD. The fabricated device with Lg = 4 μm exhibits a record maximum transconductance (gm_max) in excess of 520 μS/μm at >1 μm region, and reasonably good electrostatic integrity, such as SS = 110 mV/decade and DIBL = 43 mV/V. Also, we have investigated the gate length scaling behavior in terms of output, transconductance, and transfer characteristics. In particular, our devices feature very uniform values of the electrostatic integrity, such as SS = 100-110 mV/decade, VT = -0.25 V to -0.2 V and DIBL = 40-50 mV/V, as Lg decreases from 10 μm to 4 μm. Furthermore, we have explored the impact of source resistance (RS) onto the device characteristics of the InGaAs QW MOSFETs. In doing so, we have modeled both measured extrinsic transconductance (gm_ext) and intrinsic transconductance (gm_int) as a function of Lg.

  2. Gamma and proton irradiation effects and thermal stability of electrical characteristics of metal-oxide-silicon capacitors with atomic layer deposited Al2O3 dielectric

    NASA Astrophysics Data System (ADS)

    Rafí, J. M.; Pellegrini, G.; Fadeyev, V.; Galloway, Z.; Sadrozinski, H. F.-W.; Christophersen, M.; Phlips, B. F.; Lynn, D.; Kierstead, J.; Hoeferkamp, M.; Gorelov, I.; Palni, P.; Wang, R.; Seidel, S.

    2016-02-01

    The radiation hardness and thermal stability of the electrical characteristics of atomic layer deposited Al2O3 layers to be used as passivation films for silicon radiation detectors with slim edges are investigated. To directly measure the interface charge and to evaluate its change with the ionizing dose, metal-oxide-silicon (MOS) capacitors implementing differently processed Al2O3 layers were fabricated on p-type silicon substrates. Qualitatively similar results are obtained for degradation of capacitance-voltage and current-voltage characteristics under gamma and proton irradiations up to equivalent doses of 30 Mrad and 21.07 Mrad, respectively. While similar negative charge densities are initially extracted for all non-irradiated capacitors, superior radiation hardness is obtained for MOS structures with alumina layers grown with H2O instead of O3 as oxidant precursor. Competing effects between radiation-induced positive charge trapping and hydrogen release from the H2O-grown Al2O3 layers may explain their higher radiation resistance. Finally, irradiated and non-irradiated MOS capacitors with differently processed Al2O3 layers have been subjected to thermal treatments in air at temperatures ranging between 100 °C and 200 °C and the thermal stability of their electrical characteristics has been evaluated. Partial recovery of the gamma-induced degradation has been noticed for O3-grown MOS structures. This can be explained by a trapped holes emission process, for which an activation energy of 1.38 ± 0.15 eV has been extracted.

  3. Gamma and proton irradiation effects and thermal stability of electrical characteristics of metal-oxide-silicon capacitors with atomic layer deposited Al2O3 dielectric

    DOE PAGESBeta

    J. M. Rafi; Lynn, D.; Pellegrini, G.; Fadeyev, V.; Galloway, Z.; Sadrozinski, H. F. -W.; Christophersen, M.; Philips, B. F.; Kierstead, J.; Hoeferkamp, M.; et al

    2015-12-11

    The radiation hardness and thermal stability of the electrical characteristics of atomic layer deposited Al2O3 layers to be used as passivation films for silicon radiation detectors with slim edges are investigated. To directly measure the interface charge and to evaluate its change with the ionizing dose, metal-oxide-silicon (MOS) capacitors implementing differently processed Al2O3 layers were fabricated on p-type silicon substrates. Qualitatively similar results are obtained for degradation of capacitance–voltage and current–voltage characteristics under gamma and proton irradiations up to equivalent doses of 30 Mrad and 21.07 Mrad, respectively. While similar negative charge densities are initially extracted for all non-irradiated capacitors,more » superior radiation hardness is obtained for MOS structures with alumina layers grown with H2O instead of O3 as oxidant precursor. Competing effects between radiation-induced positive charge trapping and hydrogen release from the H2O-grown Al2O3 layers may explain their higher radiation resistance. Finally, irradiated and non-irradiated MOS capacitors with differently processed Al2O3 layers have been subjected to thermal treatments in air at temperatures ranging between 100 °C and 200 °C and the thermal stability of their electrical characteristics has been evaluated. Partial recovery of the gamma-induced degradation has been noticed for O3-grown MOS structures. Lastly, this can be explained by a trapped holes emission process, for which an activation energy of 1.38 ± 0.15 eV has been extracted.« less

  4. Novel integration of ultrathin Al2O3 with low-k dielectric as bilayer liner for capacitance optimization and stress mitigation in Cu through-silicon-via

    NASA Astrophysics Data System (ADS)

    Zhang, Lin; Li, Hong Yu; Shang, Yang; Yoo, Woosik; Yu, Hao; Tan, Chuan Seng

    2016-04-01

    Through-silicon-via (TSV) used in three-dimensional (3D) stacked dies must present small electrical parasitic, such as capacitance, to allow for low latency signal transmission. Stable TSV capacitance is desired to overcome the spatial circuit performance variation caused by non-uniform hot-spot heating. In this work, a novel combination of low-k with ultrathin Al2O3 bilayer liner is successfully integrated in the TSV. The TSV capacitance is reduced by ˜26% as compared to plasma-enhanced tetrahydrothosilicate (PETEOS) oxide liner. Stable TSV capacitance within the operating voltage of interest (˜0-5 V) is achieved by operating the TSV in a stable accumulation capacitance region. The positive shift in the flat-band voltage (ΔV FB = +19 V) is achieved by utilizing Al2O3-induced negative fixed charge (|Q f| = 1.3 × 1012 cm-2) at the Si/low-k interface. Leakage current density of the bilayer liner is improved to a level comparable with the PETEOS oxide liner post annealing [forming gas (N2/H2) at 350 °C for 2 h or 400 °C for 0.5 h]. Low-k material with a smaller elastic modulus improves the thermo-mechanical stress exerted on the surrounding Si substrate compared with PETEOS oxide.

  5. High-performance GaAs-based metal-oxide-semiconductor heterostructure field-effect transistors with atomic-layer-deposited Al2O3 gate oxide and in situ AlN passivation by metalorganic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Aoki, Takeshi; Fukuhara, Noboru; Osada, Takenori; Sazawa, Hiroyuki; Hata, Masahiko; Inoue, Takayuki

    2014-10-01

    GaAs-based metal-oxide-semiconductor heterostructure field-effect transistors (MOSHFETs) with Al2O3 gate oxide and in situ AlN passivation were investigated. Passivation with AlN improved the quality of the MOS interfaces, leading to good control of the gate. The devices had a sufficiently small subthreshold swing of 84 mV decade-1 in the drain current vs gate voltage curves, as well as negligible frequency dispersions and nearly zero hysteresis in the gate capacitance vs gate voltage curves. A maximum drain current of 630 mA/mm and a peak effective mobility of 6720 cm2 V-1 s-1 at a sheet carrier density of 3 × 1012 cm-2 were achieved.

  6. Investigation of spatial charge distribution and electrical dipole in atomic layer deposited Al2O3 on 4H-SiC

    NASA Astrophysics Data System (ADS)

    Han, Kai; Wang, Xiaolei; Yuan, Li; Wang, Wenwu

    2016-06-01

    Charge distribution and electrical dipole in an Al2O3/4H-SiC structure are investigated by capacitance–voltage measurement and x-ray photoelectron spectroscopy (XPS). The charge densities in Al2O3 and at the Al2O3/4H-SiC interface are negligible and  ‑6.89  ×  1011 cm‑2, respectively. Thus the small charge amount indicates the suitability of Al2O3 as a gate dielectric. The dipole at the Al2O3/4H-SiC interface is  ‑0.3 to  ‑0.91 V. The XPS manifests electron transfer from Al2O3 to 4H-SiC. The dipole formation is explained by a gap state model and the higher charge neutrality level of Al2O3 than the Fermi level of 4H-SiC, which confirms the feasibility of the gap state model on investigating band lineup at heterojunctions. The electrical dipole at the Al2O3/4H-SiC interface is critical for threshold voltage tuning. These results are helpful in engineering the SiC based gate stacks.

  7. Effect of ZnO channel thickness on the device behaviour of nonvolatile memory thin film transistors with double-layered gate insulators of Al2O3 and ferroelectric polymer

    NASA Astrophysics Data System (ADS)

    Yoon, Sung-Min; Yang, Shin-Hyuk; Park, Sang-Hee Ko; Jung, Soon-Won; Cho, Doo-Hee; Byun, Chun-Won; Kang, Seung-Youl; Hwang, Chi-Sun; Yu, Byoung-Gon

    2009-12-01

    Poly(vinylidene fluoride trifluoroethylene) and ZnO were employed for nonvolatile memory thin film transistors as ferroelectric gate insulator and oxide semiconducting channel layers, respectively. It was proposed that the thickness of the ZnO layer be carefully controlled for realizing the lower programming voltage, because the serially connected capacitor by the formation of a fully depleted ZnO channel had a critical effect on the off programming voltage. The fabricated memory transistor with Al/P(VDF-TrFE) (80 nm)/Al2O3 (4 nm)/ZnO (5 nm) exhibits encouraging behaviour such as a memory window of 3.8 V at the gate voltage of -10 to 12 V, and 107 on/off ratio, and a gate leakage current of 10-11 A.

  8. Transport mechanisms of leakage current in Al2O3/InAlAs MOS capacitors

    NASA Astrophysics Data System (ADS)

    Jin, Chengji; Lu, Hongliang; Zhang, Yimen; Zhang, Yuming; Guan, He; Wu, Lifan; Lu, Bin; Liu, Chen

    2016-09-01

    An Al2O3 layer is inserted between the InAlAs layer and the metal gate in InAs/AlSb HEMTs to suppress the leakage current. The transport mechanisms of leakage current in Al2O3/InAlAs metal-oxide-semiconductor (MOS) capacitors at both positive and negative biases at different temperatures ranging from 10 °C to 70 °C are investigated. For positive bias, the leakage current is dominated by Schottky emission. Based on the fitted straight lines, the relative dielectric constant of Al2O3 and the barrier height between Al2O3 and InAlAs are extracted. However, for negative bias, the leakage current is dominated by Frenkel-Poole (F-P) emission and the depth of the trap energy level from the conduction band (ϕt) is extracted. Furthermore, authors explain the reason why the dominating mechanisms at positive and negative biases are different.

  9. EFFECT OF MgO ON STRUCTURE AND DIELECTRIC PROPERTIES OF CaO-Al2O3-B2O3-SiO2 GLASSES

    NASA Astrophysics Data System (ADS)

    Du, Zhao; Zhang, Xuehong; Yue, Yunlong; Wu, Haitao

    2012-12-01

    The effect of MgO on structure and dielectric properties of aluminoborosilicate glasses was investigated. FTIR data indicated that glass network was mainly built by tetrahedral [SiO4], [BO4], [AlO4] and trigonal [BO3]. A small amount of AlO5 or AlO6 units also existed. The glass system was characterized with lower dielectric constant (4.17 4.6) and dielectric loss (12.3 × 10-4 14.77 × 10-4) at 1 MHz. With the increase of MgO content, the quantity of AlO5 or AlO6 units decreased. The variation of density showed a decreasing tendency. The dielectric constant and loss were all found to decrease.

  10. The dispersion in accumulation at InGaAs-based metal/oxide/semiconductor gate stacks with a bi-layered dielectric structure

    NASA Astrophysics Data System (ADS)

    Krylov, Igor; Ritter, Dan; Eizenberg, Moshe

    2015-08-01

    InGaAs gate stacks comprising the moderate dielectric constant (k) Al2O3 have a significantly lower dispersion in accumulation in comparison to stacks with the high-k HfO2 of the same physical thickness. As a result, a HfO2/Al2O3 bi-layer structure seems attractive in terms of both high effective dielectric constant and low dispersion in accumulation. The influence of Al2O3 thickness on the dispersion was investigated in metal/HfO2/Al2O3/InGaAs gate stacks with a fixed overall dielectric thickness. An effective suppression of the dispersion with the increase of the Al2O3 thickness was observed. However, the Al2O3 thickness required for passivation of the dispersion in accumulation was significantly higher in comparison to both the border traps related tunneling distance in Al2O3 and the minimal thickness required for the Al2O3/InGaAs band offset stabilization. The phenomenon can be explained by the lower dielectric constant of Al2O3 film (compared to the subsequently deposited HfO2 layer), where Al2O3 dielectric constant dependence on the film thickness enhances the dispersion intensity. As a result, the guidelines for the passivation layer engineering are: maximization of both majority carriers band offsets and of the dielectric constant of the passivation layer.

  11. Atomic Layer Deposition of Al2O3 on WSe2 Functionalized by Titanyl Phthalocyanine.

    PubMed

    Park, Jun Hong; Fathipour, Sara; Kwak, Iljo; Sardashti, Kasra; Ahles, Christopher F; Wolf, Steven F; Edmonds, Mary; Vishwanath, Suresh; Xing, Huili Grace; Fullerton-Shirey, Susan K; Seabaugh, Alan; Kummel, Andrew C

    2016-07-26

    To deposit an ultrathin dielectric onto WSe2, monolayer titanyl phthalocyanine (TiOPc) is deposited by molecular beam epitaxy as a seed layer for atomic layer deposition (ALD) of Al2O3 on WSe2. TiOPc molecules are arranged in a flat monolayer with 4-fold symmetry as measured by scanning tunneling microscopy. ALD pulses of trimethyl aluminum and H2O nucleate on the TiOPc, resulting in a uniform deposition of Al2O3, as confirmed by atomic force microscopy and cross-sectional transmission electron microscopy. The field-effect transistors (FETs) formed using this process have a leakage current of 0.046 pA/μm(2) at 1 V gate bias with 3.0 nm equivalent oxide thickness, which is a lower leakage current than prior reports. The n-branch of the FET yielded a subthreshold swing of 80 mV/decade. PMID:27305595

  12. Microwave Dielectric Properties of TiO2-Added Li2ZnTi3O8 Ceramics Doped with Li2O-Al2O3-B2O3 Glass

    NASA Astrophysics Data System (ADS)

    Li, Ying-xiang; Qin, Zhen-jun; Tang, Bin; Zhang, Shu-ren; Chang, Geng; Li, Hao; Chen, He-tuo; Yang, Han; Li, Jun-shan

    2015-01-01

    The effect of Li2O-Al2O3-B2O3 (LAB) glass addition on phase composition, microstructure and the microwave dielectric properties of Li2ZnTi3O8 ceramics with TiO2 were investigated using x-ray diffraction (XRD), scanning electron microscopy (SEM), energy-dispersive x-ray spectroscopy (EDS) and a vector network analyzer. With the addition of 17 mol% TiO2 on Li2ZnTi3O8 ceramics, the temperature coefficient of the resonant frequency ( τ ƒ) value could be adjusted to +3.3 ppm/°C. When a small amount of LAB glass was added to the Li2ZnTi3O8 + 17 mol% TiO2 materials, the sintering temperature could be significantly lowered from 1160°C to 900°C. With increasing the LAB glass, the Q × f value first increased and then decreased. Typically, the 1 wt.% LAB glass-added Li2ZnTi3O8 + 17 mol% TiO2 ceramics sintered at 900°C for 4 h had good microwave dielectric properties with ɛr = 26.8, Q × f = 28,000 GHz and τ ƒ = + 2.5 ppm/°C, which made it a promising ceramic for LTCC technology application.

  13. Tensile Behavior of Al2o3/feal + B and Al2o3/fecraly Composites

    NASA Technical Reports Server (NTRS)

    Draper, S. L.; Eldridge, J. I.; Aiken, B. J. M.

    1995-01-01

    The feasibility of Al2O3/FeAl + B and Al2O3/FeCrAlY composites for high-temperature applications was assessed. The major emphasis was on tensile behavior of both the monolithics and composites from 298 to 1100 K. However, the study also included determining the chemical compatibility of the composites, measuring the interfacial shear strengths, and investigating the effect of processing on the strength of the single-crystal Al2O3 fibers. The interfacial shear strengths were low for Al203/FeAl + B and moderate to high for Al203/FeCrAlY. The difference in interfacial bond strengths between the two systems affected the tensile behavior of the composites. The strength of the Al203 fiber was significantly degraded after composite processing for both composite systems and resulted in poor composite tensile properties. The ultimate tensile strength (UTS) values of the composites could generally be predicted with either rule of mixtures (ROM) calculations or existing models when using the strength of the etched-out fiber. The Al2O3/FeAl + B composite system was determined to be unfeasible due to poor interfacial shear strengths and a large mismatch in coefficient of thermal expansion (CTE). Development of the Al2O3/FeCrAlY system would require an effective diffusion barrier to minimize the fiber strength degradation during processing and elevated temperature service.

  14. High Temperature Mechanical Characterization and Analysis of Al2O3 /Al2O3 Composition

    NASA Technical Reports Server (NTRS)

    Gyekenyesi, John Z.; Jaskowiak, Martha H.

    1999-01-01

    Sixteen ply unidirectional zirconia coated single crystal Al2O3 fiber reinforced polycrystalline Al2O3 was tested in uniaxial tension at temperatures to 1400 C in air. Fiber volume fractions ranged from 26 to 31%. The matrix has primarily open porosity of approximately 40%. Theories for predicting the Young's modulus, first matrix cracking stress, and ultimate strength were applied and evaluated for suitability in predicting the mechanical behavior of Al2O3/Al2O3 composites. The composite exhibited pseudo tough behavior (increased area under the stress/strain curve relative to monolithic alumina) from 22 to 1400 C. The rule-of-mixtures provides a good estimate of the Young's modulus of the composite using the constituent properties from room temperature to approximately 1200 C for short term static tensile tests in air. The ACK theory provides the best approximation of the first matrix cracking stress while accounting for residual stresses at room temperature. Difficulties in determining the fiber/matrix interfacial shear stress at high temperatures prevented the accurate prediction of the first matrix cracking stress above room temperature. The theory of Cao and Thouless, based on Weibull statistics, gave the best prediction for the composite ultimate tensile strength.

  15. Enhanced ZnO Thin-Film Transistor Performance Using Bilayer Gate Dielectrics.

    PubMed

    Alshammari, Fwzah H; Nayak, Pradipta K; Wang, Zhenwei; Alshareef, Husam N

    2016-09-01

    We report ZnO TFTs using Al2O3/Ta2O5 bilayer gate dielectrics grown by atomic layer deposition. The saturation mobility of single layer Ta2O5 dielectric TFT was 0.1 cm(2) V(-1) s(-1), but increased to 13.3 cm(2) V(-1) s(-1) using Al2O3/Ta2O5 bilayer dielectric with significantly lower leakage current and hysteresis. We show that point defects present in ZnO film, particularly VZn, are the main reason for the poor TFT performance with single layer dielectric, although interfacial roughness scattering effects cannot be ruled out. Our approach combines the high dielectric constant of Ta2O5 and the excellent Al2O3/ZnO interface quality, resulting in improved device performance. PMID:27553091

  16. Electroforming and Ohmic contacts in Al-Al2O3-Ag diodes

    NASA Astrophysics Data System (ADS)

    Hickmott, T. W.

    2012-03-01

    Electroforming of metal-insulator-metal (MIM) diodes is a non-destructive dielectric breakdown process that changes the diode from its initial high resistance state (HRS) to a low resistance state (LRS). After electroforming, resistance switching memories (RSMs) use voltages to switch from HRS to LRS and back. Many MIM combinations are proposed for use in RSMs. In many cases conduction in the LRS is nearly temperature independent at low temperatures; an Ohmic contact with a barrier to electron injection of ˜0 eV results from electroforming. Electroforming of Al-Al2O3-Ag diodes with amorphous anodic Al2O3 thicknesses between 12 and 41 nm has been studied. Two anodizing electrolytes have been used; 0.1 M ammonium pentaborate (bor-H2O) and a solution of 0.1 M of ammonium pentaborate per liter of ethylene glycol (bor-gly). Polarization of Al2O3 and negative charge in Al2O3 are much larger when Al2O3 is formed in bor-H2O solution than when Al is anodized in bor-gly solution. Electroforming of Al-Al2O3-Ag diodes results in an Ohmic contact at the Al-Al2O3 interface, voltage-controlled negative resistance (VCNR) in the current-voltage (I-V) characteristics, electroluminescence (EL), and electron emission into vacuum (EM) from filamentary conducting channels. Two distinct modes of electroforming occur for Al-Al2O3-Ag diodes. α-forming occurs for 2.5 V ≲ VS ≲ 5 V, where VS is the applied voltage. It is characterized by an abrupt current jump with the simultaneous appearance of EL and EM. β-forming occurs for VS ≳ 7 V. I-V curves, EL, and EM develop gradually and are smaller than for α-forming. Electroforming occurs more readily for diodes with Al2O3 formed in bor-H2O that have greater defect densities. Fully developed I-V curves have similar VCNR, EL, and EM after α-forming or β-forming. A model is proposed in which excited states of F-centers, oxygen vacancies in amorphous anodic Al2O3, form defect conduction bands. Electroforming that results in an Ohmic

  17. Dependence of electrostatic potential distribution of Al2O3/Ge structure on Al2O3 thickness

    NASA Astrophysics Data System (ADS)

    Wang, Xiaolei; Xiang, Jinjuan; Wang, Wenwu; Zhao, Chao; Zhang, Jing

    2016-09-01

    Electrostatic potential distribution of Al2O3/Ge structure is investigated vs. Al2O3 thickness by X-ray photoelectron spectroscopy (XPS). The electrostatic potential distribution is found to be Al2O3 thickness dependent. This interesting phenomenon is attributed to the appearance of gap states on Al2O3 surface (GSAl2O3) and its higher charge neutrality level (CNL) compared with the CNL of gap states at Al2O3/Ge interface (GSAl2O3/Ge), leading to electron transfer from GSAl2O3 to GSAl2O3/Ge. In the case of thicker Al2O3, fewer electrons transfer from GSAl2O3 to GSAl2O3/Ge, resulting in a larger potential drop across Al2O3 and XPS results.

  18. Effects of ozone post deposition treatment on interfacial and electrical characteristics of atomic-layer-deposited Al2O3 and HfO2 films on GaSb substrates

    NASA Astrophysics Data System (ADS)

    Zhao, Lianfeng; Tan, Zhen; Wang, Jing; Xu, Jun

    2014-01-01

    Atomic-layer-deposited Al2O3 and HfO2 films on GaSb substrates were treated by in-situ ozone post deposition treatment (PDT). The effects of ozone PDT on the interfacial and electrical properties of Al2O3 and HfO2 gate dielectric films on GaSb substrates were investigated carefully. It is found that the dielectric quality and the interfacial properties of the Al2O3 and HfO2 films are improved by ozone PDT. After in-situ ozone PDT for 5 min, the Al2O3 and HfO2 films on GaSb substrates exhibit improved electrical and interfacial properties, such as reduced frequency dispersion, gate leakage current, border traps and interface traps. Interface trap density is reduced by ∼24% for the Al2O3/GaSb stacks and ∼27% for the HfO2/GaSb stacks. In-situ ozone PDT is proved to be a promising technique in improving the quality of high-k gate stacks on GaSb substrates.

  19. Comparison of the degradation characteristics of AlON/InGaAs and Al2O3/InGaAs stacks

    NASA Astrophysics Data System (ADS)

    Palumbo, F.; Krylov, I.; Eizenberg, M.

    2015-03-01

    In this paper, the degradation characteristics of MOS (Metal-Oxide-Semiconductor) stacks with Al2O3/AlON or Al2O3 only as dielectric layers on InGaAs were studied. The dielectric nitrides are proposed as possible passivation layers to prevent InGaAs oxidation. At negative bias, it has been found out that the main contribution to the overall degradation of the gate oxide is dominated by the generation of positive charge in the gate oxide. This effect is pronounced in MOS stacks with Al2O3/AlON as dielectric, where we think the positive charge is mainly generated in the AlON interlayer. At positive bias, the degradation is dominated by buildup of negative charge due to electron trapping in pre-existing or stress-induced traps. For stress biases where the leakage currents are low, the changes in the electrical characteristics are dominated by electron-trapping into traps located in energy levels in the upper part of the semiconductor gap. For stress biases with higher leakage current levels, the electron trapping occurs in stress-induced traps increasing the shift of VFB towards positive bias. The overall results clearly show that the improvement of the high-k dielectric/InGaAs interface by introducing N into the Al-oxide does not necessarily mean an increase in the reliability of the MOS stack.

  20. Electrowetting properties of atomic layer deposited Al2O3 decorated silicon nanowires

    NASA Astrophysics Data System (ADS)

    Rajkumar, K.; Rajavel, K.; Cameron, D. C.; Mangalaraj, D.; Rajendrakumar, R. T.

    2015-06-01

    This paper reports the electrowetting properties of liquid droplet on superhydrophobic silicon nanowires with Atomic layer deposited (ALD) Al2O3 as dielectric layer. Silicon wafer were etched by metal assisted wet chemical etching with silver as catalyst. ALD Al2O3 films of 10nm thickness were conformally deposited over silicon nanowires. Al2O3 dielectric film coated silicon nanowires was chemically modified with Trichloro (1H, 1H, 2H, 2H-perfluorooctyl) silane to make it superhydrophobic(SHP). The contact angle was measured and all the samples exhibited superhydrophobic nature with maximum contact angles of 163° and a minimum contact angle hysteresis of 6°. Electrowetting induced a maximum reversible decrease of the contact angle of 20°at 150V in air.

  1. Structure, optical properties and thermal stability of Al2O3-WC nanocomposite ceramic spectrally selective solar absorbers

    NASA Astrophysics Data System (ADS)

    Gao, Xiang-Hu; Wang, Cheng-Bing; Guo, Zhi-Ming; Geng, Qing-Fen; Theiss, Wolfgang; Liu, Gang

    2016-08-01

    Traditional metal-dielectric composite coating has found important application in spectrally selective solar absorbers. However, fine metal particles can easily diffuse, congregate, or be oxidized at high temperature, which causes deterioration in the optical properties. In this work, we report a new spectrally selective solar absorber coating, composed of low Al2O3 ceramic volume fraction (Al2O3(L)-WC) layer, high Al2O3 ceramic volume fraction (Al2O3(H)-WC layer) and Al2O3 antireflection layer. The features of our work are: 1) compared with the metal-dielectric composites concept, Al2O3-WC nanocomposite ceramic successfully achieves the all-ceramic concept, which exhibits a high solar absorptance of 0.94 and a low thermal emittance of 0.08, 2) Al2O3 and WC act as filler material and host material, respectively, which are different from traditional concept, 3) Al2O3-WC nanocomposite ceramic solar absorber coating exhibits good thermal stability at 600 °C. In addition, the solar absorber coating is successfully modelled by a commercial optical simulation programme, the result of which agrees with the experimental results.

  2. Growth, Quantitative Growth Analysis, and Applications of Graphene on γ-Al2O3 catalysts

    NASA Astrophysics Data System (ADS)

    Park, Jaehyun; Lee, Joohwi; Choi, Jung-Hae; Hwang, Do Kyung; Song, Yong-Won

    2015-07-01

    The possibilities offered by catalytic γ-Al2O3 substrates are explored, and the mechanism governing graphene formation thereon is elucidated using both numerical simulations and experiments. The growth scheme offers metal-free synthesis at low temperature, grain-size customization, large-area uniformity of electrical properties, single-step preparation of graphene/dielectric structures, and readily detachable graphene. We quantify based on thermodynamic principles the activation energies associated with graphene nucleation/growth on γ-Al2O3, verifying the low physical and chemical barriers. Importantly, we derive a universal equation governing the adsorption-based synthesis of graphene over a wide range of temperatures in both catalytic and spontaneous growth regimes. Experimental results support the equation, highlighting the catalytic function of γ-Al2O3 at low temperatures. The synthesized graphene is manually incorporated as a ‘graphene sticker’ into an ultrafast mode-locked laser.

  3. Growth, Quantitative Growth Analysis, and Applications of Graphene on γ-Al2O3 catalysts

    PubMed Central

    Park, Jaehyun; Lee, Joohwi; Choi, Jung-Hae; Hwang, Do Kyung; Song, Yong-Won

    2015-01-01

    The possibilities offered by catalytic γ-Al2O3 substrates are explored, and the mechanism governing graphene formation thereon is elucidated using both numerical simulations and experiments. The growth scheme offers metal-free synthesis at low temperature, grain-size customization, large-area uniformity of electrical properties, single-step preparation of graphene/dielectric structures, and readily detachable graphene. We quantify based on thermodynamic principles the activation energies associated with graphene nucleation/growth on γ-Al2O3, verifying the low physical and chemical barriers. Importantly, we derive a universal equation governing the adsorption-based synthesis of graphene over a wide range of temperatures in both catalytic and spontaneous growth regimes. Experimental results support the equation, highlighting the catalytic function of γ-Al2O3 at low temperatures. The synthesized graphene is manually incorporated as a ‘graphene sticker’ into an ultrafast mode-locked laser. PMID:26137994

  4. Properties of the c-Si/Al2O3 interface of ultrathin atomic layer deposited Al2O3 layers capped by SiNx for c-Si surface passivation

    NASA Astrophysics Data System (ADS)

    Schuldis, D.; Richter, A.; Benick, J.; Saint-Cast, P.; Hermle, M.; Glunz, S. W.

    2014-12-01

    This work presents a detailed study of c-Si/Al2O3 interfaces of ultrathin Al2O3 layers deposited with atomic layer deposition (ALD), and capped with SiNx layers deposited with plasma-enhanced chemical vapor deposition. A special focus was the characterization of the fixed charge density of these dielectric stacks and the interface defect density as a function of the Al2O3 layer thickness for different ALD Al2O3 deposition processes (plasma-assisted ALD and thermal ALD) and different thermal post-deposition treatments. Based on theoretical calculations with the extended Shockley-Read-Hall model for surface recombination, these interface properties were found to explain well the experimentally determined surface recombination. Thus, these interface properties provide fundamental insights into to the passivation mechanisms of these Al2O3/SiNx stacks, a stack system highly relevant, particularly for high efficiency silicon solar cells. Based on these findings, it was also possible to improve the surface passivation quality of stacks with thermal ALD Al2O3 by oxidizing the c-Si surface prior to the Al2O3 deposition.

  5. Space-charge-controlled field emission model of current conduction through Al2O3 films

    NASA Astrophysics Data System (ADS)

    Hiraiwa, Atsushi; Matsumura, Daisuke; Kawarada, Hiroshi

    2016-02-01

    This study proposes a model for current conduction in metal-insulator-semiconductor (MIS) capacitors, assuming the presence of two sheets of charge in the insulator, and derives analytical formulae of field emission (FE) currents under both negative and positive bias. Since it is affected by the space charge in the insulator, this particular FE differs from the conventional FE and is accordingly named the space-charge-controlled (SCC) FE. The gate insulator of this study was a stack of atomic-layer-deposition Al2O3 and underlying chemical SiO2 formed on Si substrates. The current-voltage (I-V) characteristics simulated using the SCC-FE formulae quantitatively reproduced the experimental results obtained by measuring Au- and Al-gated Al2O3/SiO2 MIS capacitors under both biases. The two sheets of charge in the Al2O3 films were estimated to be positive and located at a depth of greater than 4 nm from the Al2O3/SiO2 interface and less than 2 nm from the gate. The density of the former is approximately 1 × 1013 cm-2 in units of electronic charge, regardless of the type of capacitor. The latter forms a sheet of dipoles together with image charges in the gate and hence causes potential jumps of 0.4 V and 1.1 V in the Au- and Al-gated capacitors, respectively. Within a margin of error, this sheet of dipoles is ideally located at the gate/Al2O3 interface and effectively reduces the work function of the gate by the magnitude of the potential jumps mentioned above. These facts indicate that the currents in the Al2O3/SiO2 MIS capacitors are enhanced as compared to those in ideal capacitors and that the currents in the Al-gated capacitors under negative bias (electron emission from the gate) are more markedly enhanced than those in the Au-gated capacitors. The larger number of gate-side dipoles in the Al-gated capacitors is possibly caused by the reaction between the Al and Al2O3, and therefore gate materials that do not react with underlying gate insulators should be chosen

  6. Characteristics of nanocomposite ZrO2/Al2O3 films deposited by plasma-enhanced atomic layer deposition.

    PubMed

    Yun, Sun Jin; Lim, Jung Wook; Kim, Hyun-Tak

    2007-11-01

    Nanocomposite ZrO2/Al2O3 (ZAO) films were deposited on Si by plasma-enhanced atomic layer deposition and the film characteristics including interfacial oxide formation, dielectric constant (k), and electrical breakdown strength were investigated without post-annealing process. In both the mixed and nano-laminated ZAO films, the thickness of the interfacial oxide layer (T(IL)) was considerably reduced compared to ZrO2 and Al2O3 films. The T(IL) was 0.8 nm in nano-composite films prepared at a mixing ratio (ZrO2:Al2O3) of 1:1. The breakdown strength and the leakage current level were greatly improved by adding Al2O3 as little as 7.9% compared to that of ZrO2 and were enhanced more with increasing content of Al2O3. The k of ZrO2 and mixed ZAO (Al2O3 7.9%) films were 20.0 and 16.5, respectively. These results indicate that the addition of Al2O3 to ZrO2 greatly improves the electrical properties with less cost of k compared to the addition of SiO2. PMID:18047146

  7. Understanding the gradual reset in Pt/Al2O3/Ni RRAM for synaptic applications

    NASA Astrophysics Data System (ADS)

    Sarkar, Biplab; Lee, Bongmook; Misra, Veena

    2015-10-01

    In this work, a study has been performed to understand the gradual reset in Al2O3 resistive random-access memory (RRAM). Concentration of vacancies created during the forming or set operation is found to play a major role in the reset mechanism. The reset was observed to be gradual when a significantly higher number of vacancies are created in the dielectric during the set event. The vacancy concentration inside the dielectric was increased using a multi-step forming method which resulted in a diffusion-dominated gradual filament dissolution during the reset in Al2O3 RRAM. The gradual dissolution of the filament allows one to control the conductance of the dielectric during the reset. RRAM devices with gradual reset show excellent endurance and retention for multi-bit storage. Finally, the conductance modulation characteristics realizing synaptic learning are also confirmed in the RRAM.

  8. Interfacial band configuration and electrical properties of LaAlO3/Al2O3/hydrogenated-diamond metal-oxide-semiconductor field effect transistors

    NASA Astrophysics Data System (ADS)

    Liu, J. W.; Liao, M. Y.; Imura, M.; Oosato, H.; Watanabe, E.; Tanaka, A.; Iwai, H.; Koide, Y.

    2013-08-01

    In order to search a gate dielectric with high permittivity on hydrogenated-diamond (H-diamond), LaAlO3 films with thin Al2O3 buffer layers are fabricated on the H-diamond epilayers by sputtering-deposition (SD) and atomic layer deposition (ALD) techniques, respectively. Interfacial band configuration and electrical properties of the SD-LaAlO3/ALD-Al2O3/H-diamond metal-oxide-semiconductor field effect transistors (MOSFETs) with gate lengths of 10, 20, and 30 μm have been investigated. The valence and conduction band offsets of the SD-LaAlO3/ALD-Al2O3 structure are measured by X-ray photoelectron spectroscopy to be 1.1 ± 0.2 and 1.6 ± 0.2 eV, respectively. The valence band discontinuity between H-diamond and LaAlO3 is evaluated to be 4.0 ± 0.2 eV, showing that the MOS structure acts as the gate which controls a hole carrier density. The leakage current density of the SD-LaAlO3/ALD-Al2O3/H-diamond MOS diode is smaller than 10-8 A cm-2 at gate bias from -4 to 2 V. The capacitance-voltage curve in the depletion mode shows sharp dependence, small flat band voltage, and small hysteresis shift, which implies low positive and trapped charge densities. The MOSFETs show p-type channel and complete normally off characteristics with threshold voltages changing from -3.6 ± 0.1 to -5.0 ± 0.1 V dependent on the gate length. The drain current maximum and the extrinsic transconductance of the MOSFET with gate length of 10 μm are -7.5 mA mm-1 and 2.3 ± 0.1 mS mm-1, respectively. The enhancement mode SD-LaAlO3/ALD-Al2O3/H-diamond MOSFET is concluded to be suitable for the applications of high power and high frequency electrical devices.

  9. Electrical characteristics of SrTiO3/Al2O3 laminated film capacitors

    NASA Astrophysics Data System (ADS)

    Peng, Yong; Yao, Manwen; Chen, Jianwen; Xu, Kaien; Yao, Xi

    2016-07-01

    The electrical characteristics of SrTiO3/Al2O3 (160 nm up/90 nm down) laminated film capacitors using the sol-gel process have been investigated. SrTiO3 is a promising and extensively studied high-K dielectric material, but its leakage current property is poor. SrTiO3/Al2O3 laminated films can effectively suppress the demerits of pure SrTiO3 films under low electric field, but the leakage current value reaches to 0.1 A/cm2 at higher electric field (>160 MV/m). In this study, a new approach was applied to reduce the leakage current and improve the dielectric strength of SrTiO3/Al2O3 laminated films. Compared to laminated films with Au top electrodes, dielectric strength of laminated films with Al top electrodes improves from 205 MV/m to 322 MV/m, simultaneously the leakage current maintains the same order of magnitude (10-4 A/cm2) until the breakdown occurs. The above electrical characteristics are attributed to the anodic oxidation reaction in origin, which can repair the defects of laminated films at higher electric field. The anodic oxidation reactions have been confirmed by the corresponding XPS measurement and the cross sectional HRTEM analysis. This work provides a new approach to fabricate dielectrics with high dielectric strength and low leakage current.

  10. Simulation of dual-gate SOI MOSFET with different dielectric layers

    NASA Astrophysics Data System (ADS)

    Yadav, Jyoti; Chaudhary, R.; Mukhiya, R.; Sharma, R.; Khanna, V. K.

    2016-04-01

    The paper presents the process design and simulation of silicon-on-insulator (SOI)-based dual-gate metal oxide field-effect transistor (DG-MOSFET) stacked with different dielectric layers on the top of gate oxide. A detailed 2D process simulation of SOI-MOSFETs and its electrical characterization has been done using SILVACO® TCAD tool. A variation in transconductance was observed with different dielectric layers, AlN-gate MOSFET having the highest tranconductance value as compared to other three dielectric layers (SiO2, Si3N4 and Al2O3).

  11. Distinctive electrical properties in sandwich-structured Al2O3/low density polyethylene nanocomposites

    NASA Astrophysics Data System (ADS)

    Wang, Si-Jiao; Zha, Jun-Wei; Li, Wei-Kang; Dang, Zhi-Min

    2016-02-01

    The sandwich-structured Al2O3/low density polyethylene (Al2O3/LDPE) nanocomposite dielectrics consisting of layer-by-layer with different concentration Al2O3 loading were prepared by melt-blending and following hot pressing method. The space charge distribution from pulsed electro-acoustic method and breakdown strength of the nanocomposites were investigated. Compared with the single-layer Al2O3/LDPE nanocomposites, the sandwich-structured nanocomposites remarkably suppressed the space charge accumulation and presented higher breakdown strength. The charges in the sandwich-structured nanocomposites decayed much faster than that in the single-layer nanocomposites, which was attributed to an effective electric field caused by the formation of the interfacial space charges. The energy depth of shallow and deep traps was estimated as 0.73 eV and 1.17 eV in the sandwich-structured nanocomposites, respectively, according to the thermal excitation theoretical model we proposed. This work provides an attractive strategy of design and fabrication of polymer nanocomposites with excellent space charge suppression.

  12. Catalytic Methane Decomposition over Fe-Al2 O3.

    PubMed

    Zhou, Lu; Enakonda, Linga Reddy; Saih, Youssef; Loptain, Sergei; Gary, Daniel; Del-Gallo, Pascal; Basset, Jean-Marie

    2016-06-01

    The presence of a Fe-FeAl2 O4 structure over an Fe-Al2 O3 catalysts is demonstrated to be vital for the catalytic methane decomposition (CMD) activity. After H2 reduction at 750 °C, Fe-Al2 O3 prepared by means of a fusion method, containing 86.5 wt % FeAl2 O4 and 13.5 wt % Fe(0) , showed a stable CMD activity at 750 °C for as long as 10 h. PMID:27159367

  13. AlN and Al oxy-nitride gate dielectrics for reliable gate stacks on Ge and InGaAs channels

    NASA Astrophysics Data System (ADS)

    Guo, Y.; Li, H.; Robertson, J.

    2016-05-01

    AlN and Al oxy-nitride dielectric layers are proposed instead of Al2O3 as a component of the gate dielectric stacks on higher mobility channels in metal oxide field effect transistors to improve their positive bias stress instability reliability. It is calculated that the gap states of nitrogen vacancies in AlN lie further away in energy from the semiconductor band gap than those of oxygen vacancies in Al2O3, and thus AlN might be less susceptible to charge trapping and have a better reliability performance. The unfavourable defect energy level distribution in amorphous Al2O3 is attributed to its larger coordination disorder compared to the more symmetrically bonded AlN. Al oxy-nitride is also predicted to have less tendency for charge trapping.

  14. Scaling and carrier transport behavior of buried-channel In0.7Ga0.3As MOSFETs with Al2O3 insulator

    NASA Astrophysics Data System (ADS)

    Kim, Taewoo; Kim, Dae-Hyun

    2015-09-01

    In this paper, we investigate the scaling and carrier transport behavior of sub-100 nm In0.7Ga0.3As buried-channel metal-oxide-semiconductor field-effect transistors (MOSFETs) with Al2O3 as gate dielectric. The device combines a 3-nm Al2O3 layer grown by atomic-layer-deposition (ALD) and a 13-nm In0.52Al0.48As insulator grown by molecular-beam-epitaxy (MBE). Our long channel device with Lg = 200 nm exhibits excellent subthreshold characteristics, such as subthreshold-swing (S) of 68 mV/decade at VDS = 0.5 V, indicating a very good interface quality between Al2O3 and In0.52Al0.48As. In addition, a short-channel device with Lg = 60 nm maintains electrostatic integrity of the device, such as subthreshold-swing (S) = 90 mV/decade and drain-induced-barrier-lowering (DIBL) = 100 mV/V at VDS = 0.5 V. We show well-behaved electrostatic scaling behavior that follows a modified FD-SOI MOSFET model. Our experimental and theoretical research suggest that further device optimization in the form of a self-aligned contact structure and aggressive EOT scaling would lead to high-performance III-V MOSFETs for multiple types of applications.

  15. Controlled direct growth of Al2O3-doped HfO2 films on graphene by H2O-based atomic layer deposition.

    PubMed

    Zheng, Li; Cheng, Xinhong; Yu, Yuehui; Xie, Yahong; Li, Xiaolong; Wang, Zhongjian

    2015-02-01

    Graphene has been drawing worldwide attention since its discovery in 2004. In order to realize graphene-based devices, thin, uniform-coverage and pinhole-free dielectric films with high permittivity on top of graphene are required. Here we report the direct growth of Al2O3-doped HfO2 films onto graphene by H2O-based atom layer deposition (ALD). Al2O3-onto-HfO2 stacks benefited the doping of Al2O3 into HfO2 matrices more than HfO2-onto-Al2O3 stacks did due to the micro-molecular property of Al2O3 and the high chemical activity of trimethylaluminum (TMA). Al2O3 acted as a network modifier, maintained the amorphous structure of the film even to 800 °C, and made the film smooth with a root mean square (RMS) roughness of 0.8 nm, comparable to the surface of pristine graphene. The capacitance and the relative permittivity of Al2O3-onto-HfO2 stacks were up to 1.18 μF cm(-2) and 12, respectively, indicating the high quality of Al2O3-doped HfO2 films on graphene. Moreover, the growth process of Al2O3-doped HfO2 films introduced no detective defects into graphene confirmed by Raman measurements. PMID:25519447

  16. Frustration of Negative Capacitance in Al2O3/BaTiO3 Bilayer Structure

    PubMed Central

    Kim, Yu Jin; Park, Min Hyuk; Lee, Young Hwan; Kim, Han Joon; Jeon, Woojin; Moon, Taehwan; Do Kim, Keum; Jeong, Doo Seok; Yamada, Hiroyuki; Hwang, Cheol Seong

    2016-01-01

    Enhancement of capacitance by negative capacitance (NC) effect in a dielectric/ferroelectric (DE/FE) stacked film is gaining a greater interest. While the previous theory on NC effect was based on the Landau-Ginzburg-Devonshire theory, this work adopted a modified formalism to incorporate the depolarization effect to describe the energy of the general DE/FE system. The model predicted that the SrTiO3/BaTiO3 system will show a capacitance boost effect. It was also predicted that the 5 nm-thick Al2O3/150 nm-thick BaTiO3 system shows the capacitance boost effect with no FE-like hysteresis behavior, which was inconsistent with the experimental results; the amorphous-Al2O3/epitaxial-BaTiO3 system showed a typical FE-like hysteresis loop in the polarization – voltage test. This was due to the involvement of the trapped charges at the DE/FE interface, originating from the very high field across the thin Al2O3 layer when the BaTiO3 layer played a role as the NC layer. Therefore, the NC effect in the Al2O3/BaTiO3 system was frustrated by the involvement of reversible interface charge; the highly stored charge by the NC effect of the BaTiO3 during the charging period could not be retrieved during the discharging process because integral part of the polarization charge was retained within the system as a remanent polarization. PMID:26742878

  17. Frustration of Negative Capacitance in Al2O3/BaTiO3 Bilayer Structure.

    PubMed

    Kim, Yu Jin; Park, Min Hyuk; Lee, Young Hwan; Kim, Han Joon; Jeon, Woojin; Moon, Taehwan; Kim, Keum Do; Jeong, Doo Seok; Yamada, Hiroyuki; Hwang, Cheol Seong

    2016-01-01

    Enhancement of capacitance by negative capacitance (NC) effect in a dielectric/ferroelectric (DE/FE) stacked film is gaining a greater interest. While the previous theory on NC effect was based on the Landau-Ginzburg-Devonshire theory, this work adopted a modified formalism to incorporate the depolarization effect to describe the energy of the general DE/FE system. The model predicted that the SrTiO3/BaTiO3 system will show a capacitance boost effect. It was also predicted that the 5 nm-thick Al2O3/150 nm-thick BaTiO3 system shows the capacitance boost effect with no FE-like hysteresis behavior, which was inconsistent with the experimental results; the amorphous-Al2O3/epitaxial-BaTiO3 system showed a typical FE-like hysteresis loop in the polarization - voltage test. This was due to the involvement of the trapped charges at the DE/FE interface, originating from the very high field across the thin Al2O3 layer when the BaTiO3 layer played a role as the NC layer. Therefore, the NC effect in the Al2O3/BaTiO3 system was frustrated by the involvement of reversible interface charge; the highly stored charge by the NC effect of the BaTiO3 during the charging period could not be retrieved during the discharging process because integral part of the polarization charge was retained within the system as a remanent polarization. PMID:26742878

  18. Interfacial reactions and oxidation behavior of Al 2O 3 and Al 2O 3/Al coatings on an orthorhombic Ti 2AlNb alloy

    NASA Astrophysics Data System (ADS)

    Li, H. Q.; Wang, Q. M.; Gong, J.; Sun, C.

    2011-02-01

    The uniform and dense Al2O3 and Al2O3/Al coatings were deposited on an orthorhombic Ti2AlNb alloy by filtered arc ion plating. The interfacial reactions of the Al2O3/Ti2AlNb and Al2O3/Al/Ti2AlNb specimens after vacuum annealing at 750 °C were studied. In the Al2O3/Ti2AlNb specimens, the Al2O3 coating decomposed significantly due to reaction between the Al2O3 coating and the O-Ti2AlNb substrate. In the Al2O3/Al/Ti2AlNb specimens, a γ-TiAl layer and an Nb-rich zone came into being by interdiffusion between the Al layer and the O-Ti2AlNb substrate. The γ-TiAl layer is chemically compatible with Al2O3, with no decomposition of Al2O3 being detected. No internal oxidation or oxygen and nitrogen dissolution zone was observed in the O-Ti2AlNb alloy. The Al2O3/Al/Ti2AlNb specimens exhibited excellent oxidation resistance at 750 °C.

  19. Dielectric and ferroelectric properties of highly (100)-oriented (Na 0.5Bi 0.5) 0.94Ba 0.06TiO 3 thin films grown on LaNiO 3/γ-Al 2O 3/Si substrates by chemical solution deposition

    NASA Astrophysics Data System (ADS)

    Guo, Yiping; Akai, Daisuke; Sawada, Kazauki; Ishida, Makoto

    2008-07-01

    A (Na 0.5Bi 0.5) 0.94Ba 0.06TiO 3 chemical solution was prepared by using barium acetate, nitrate of sodium, nitrate of bismuth, and Ti-isopropoxide as raw materials. A white precipitation appeared during the preparation was analyzed to be Ba(NO 3) 2. We found that ethanolamine is a very effective coordinating ligand of Ba 2+. A transparent and stable (Na 0.5Bi 0.5) 0.94Ba 0.06TiO 3 precursor chemical solution has been achieved by using ethanolamine as a ligand of Ba 2+. (Na 0.5Bi 0.5) 0.94Ba 0.06TiO 3 films were grown on LaNiO 3/γ-Al 2O 3/Si substrates. Highly (100)-oriented (Na 0.5Bi 0.5) 0.94Ba 0.06TiO 3 films were obtained in this work due to lattice match growth. The dielectric, ferroelectric and insulative characteristics against applied field were studied. The conduction current shows an Ohmic conduction behavior at lower voltages and space-charge-limited behavior at higher voltages, respectively. These results indicate that, the (Na 0.5Bi 0.5) 0.94Ba 0.06TiO 3 film is a promising lead-free ferroelectric film.

  20. Time-Dependent Negative Capacitance Effects in Al2O3/BaTiO3 Bilayers.

    PubMed

    Kim, Yu Jin; Yamada, Hiroyuki; Moon, Taehwan; Kwon, Young Jae; An, Cheol Hyun; Kim, Han Joon; Kim, Keum Do; Lee, Young Hwan; Hyun, Seung Dam; Park, Min Hyuk; Hwang, Cheol Seong

    2016-07-13

    The negative capacitance (NC) effects in ferroelectric materials have emerged as the possible solution to low-power transistor devices and high-charge-density capacitors. Although the steep switching characteristic (subthreshold swing < sub-60 mV/dec) has been demonstrated in various devices combining the conventional transistors with ferroelectric gates, the actual applications of the NC effects are still some way off owing to the inherent hysteresis problem. This work reinterpreted the hysteretic properties of the NC effects within the time domain and demonstrated that capacitance (charge) boosting could be achieved without the hysteresis from the Al2O3/BaTiO3 bilayer capacitors through short-pulse charging. This work revealed that the hysteresis phenomenon in NC devices originated from the dielectric leakage of the dielectric layer. The suppression of charge injection via the dielectric leakage, which usually takes time, inhibits complete ferroelectric polarization switching during a short pulse time. It was demonstrated that a nonhysteretic NC effect can be achieved only within certain limited time and voltage ranges, but that these are sufficient for critical device applications. PMID:27231754

  1. Studies on the properties of Al2O3:Cr2O3 (50:50) thin film

    NASA Astrophysics Data System (ADS)

    Ponmudi, S.; Sivakumar, R.; Sanjeeviraja, C.

    2016-05-01

    Aluminium oxide (Al2O3) and chromium oxide (Cr2O3) thin films have received great attention of researchers because of their unique properties of corrosion/oxidation resistance and high dielectric constant. In addition, chromium aluminium oxide has been considered as a best candidate for deep-ultraviolet optical masks. In the present work, thin films of Al2O3:Cr2O3 (50:50) were deposited on pre-cleaned microscopic glass substrate by RF magnetron sputtering technique. The substrate temperature and RF power induced changes in structural, surface morphological, compositional and optical properties of the films have been studied.

  2. Mesostructured forms of gamma-Al(2)O(3).

    PubMed

    Zhang, Zhaorong; Hicks, Randall W; Pauly, Thomas R; Pinnavaia, Thomas J

    2002-02-27

    gamma-Al2O3 is one of the most extensively utilized metal oxides in heterogeneous catalysis. Conventional forms of this oxide typically exhibit a surface area and pore volume less than 250 m2/g and 0.5 cm3/g, respectively. Previous efforts to prepare mesostructured forms of alumina resulted only in structurally unstable derivatives with amorphous framework walls. The present work reports mesostructured aluminas with walls made of gamma-Al2O3, denoted MSU-gamma. These materials are structurally stable and provide surface areas and pore volumes up to 370 m2/g and 1.5 cm3/g, respectively. The key to obtaining these structures is the formation of a mesostructured surfactant/boehmite precursor, denoted MSU-S/B, assembled through the hydrolysis of an aluminum cation, oligomer, or molecule in the presence of a nonionic surfactant. Mesostructured, gamma-aluminas offer the possibility of improving the catalytic efficiency of many heterogeneous catalytic processes, such as petroleum refining, petrochemical processing, and automobile exhaust control. PMID:11853430

  3. Specific heat capacity of nanoporous Al2O3

    NASA Astrophysics Data System (ADS)

    Huang, Cong-Liang; Feng, Yan-Hui; Zhang, Xin-Xin; Li, Jing; Wang, Ge

    2013-09-01

    Based on Lindemann's criterion, a specific heat capacity model for nanoporous material was proposed by defining the surface-atom layer, to take the surface atoms and the volume atoms separately into account. The height of the surface-atom layer was determined from the experiment, and results show that only the first layer atoms on the surface should be separately considered for nanoporous Al2O3. The shape factor of the pore was also introduced in the model with values between 2 (for cylindrical pore) and 3 (for spherical pore) to characterize the morphology of the pore. It turns out experimentally that the specific heat capacity of the analyzed nanoporous Al2O3 is much larger than that of the bulk, which can be interpreted as due to the fact that the surface atom plays a more important role than the volume one. And the smaller the radius and/or the larger the porosity, which lead to a larger surface-volume ratio, the larger the specific heat capacity becomes. The nanoporous material could be a better heat storage medium than the corresponding bulk with a much lighter weight, smaller volume but higher heat storage capacity.

  4. Al2O3-based nanofluids: a review

    PubMed Central

    2011-01-01

    Ultrahigh performance cooling is one of the important needs of many industries. However, low thermal conductivity is a primary limitation in developing energy-efficient heat transfer fluids that are required for cooling purposes. Nanofluids are engineered by suspending nanoparticles with average sizes below 100 nm in heat transfer fluids such as water, oil, diesel, ethylene glycol, etc. Innovative heat transfer fluids are produced by suspending metallic or nonmetallic nanometer-sized solid particles. Experiments have shown that nanofluids have substantial higher thermal conductivities compared to the base fluids. These suspended nanoparticles can change the transport and thermal properties of the base fluid. As can be seen from the literature, extensive research has been carried out in alumina-water and CuO-water systems besides few reports in Cu-water-, TiO2-, zirconia-, diamond-, SiC-, Fe3O4-, Ag-, Au-, and CNT-based systems. The aim of this review is to summarize recent developments in research on the stability of nanofluids, enhancement of thermal conductivities, viscosity, and heat transfer characteristics of alumina (Al2O3)-based nanofluids. The Al2O3 nanoparticles varied in the range of 13 to 302 nm to prepare nanofluids, and the observed enhancement in the thermal conductivity is 2% to 36%. PMID:21762528

  5. Characterization of ultrafast microstructuring of alumina (Al2O3)

    NASA Astrophysics Data System (ADS)

    Perrie, Walter; Rushton, Anne; Gill, Matthew; Fox, Peter; O'Neill, William

    2005-03-01

    Alumina ceramic, Al2O3, presents a challenge to laser micro-structuring due to its neglible linear absorption coefficient in the optical region coupled with its physical properties such as extremely high melting point and high thermal conductivity. In this work, we demonstrate clean micro-structuring of alumina using NIR (λ=775 nm) ultrafast optical pulses with 180 fs duration at 1kHz repetition rate. Sub-picosecond pulses can minimise thermal effects along with collateral damage when processing conditions are optimised, consequently, observed edge quality is excellent in this regime. We present results of changing micro-structure and morphology during ultrafast processing along with measured ablation rates and characteristics of developing surface relief. Initial crystalline phase (alpha Al2O3) is unaltered by femtosecond processing. Multi-pulse ablation threshold fluence Fth ~ 1.1 Jcm-2 and at low fluence ~ 3 Jcm-2, independent of machined depth, there appears to remain a ~ 2μm thick rapidly re-melted layer. On the other hand, micro-structuring at high fluence F ~ 21 Jcm-2 shows no evidence of melting and the machined surface is covered with a fine layer of debris, loosely attached. The nature of debris produced by femtosecond ablation has been investigated and consists mainly of alumina nanoparticles with diameters from 20 nm to 1 micron with average diameter ~ 300 nm. Electron diffraction shows these particles to be essentially single crystal in nature. By developing a holographic technique, we have demonstrated periodic micrometer level structuring on polished samples of this extremely hard material.

  6. Isotope analysis of diamond-surface passivation effect of high-temperature H2O-grown atomic layer deposition-Al2O3 films

    NASA Astrophysics Data System (ADS)

    Hiraiwa, Atsushi; Saito, Tatsuya; Matsumura, Daisuke; Kawarada, Hiroshi

    2015-06-01

    The Al2O3 film formed using an atomic layer deposition (ALD) method with trimethylaluminum as Al precursor and H2O as oxidant at a high temperature (450 °C) effectively passivates the p-type surface conduction (SC) layer specific to a hydrogen-terminated diamond surface, leading to a successful operation of diamond SC field-effect transistors at 400 °C. In order to investigate this excellent passivation effect, we carried out an isotope analysis using D2O instead of H2O in the ALD and found that the Al2O3 film formed at a conventional temperature (100 °C) incorporates 50 times more CH3 groups than the high-temperature film. This CH3 is supposed to dissociate from the film when heated afterwards at a higher temperature (550 °C) and causes peeling patterns on the H-terminated surface. The high-temperature film is free from this problem and has the largest mass density and dielectric constant among those investigated in this study. The isotope analysis also unveiled a relatively active H-exchange reaction between the diamond H-termination and H2O oxidant during the high-temperature ALD, the SC still being kept intact. This dynamic and yet steady H termination is realized by the suppressed oxidation due to the endothermic reaction with H2O. Additionally, we not only observed the kinetic isotope effect in the form of reduced growth rate of D2O-oxidant ALD but found that the mass density and dielectric constant of D2O-grown Al2O3 films are smaller than those of H2O-grown films. This is a new type of isotope effect, which is not caused by the presence of isotopes in the films unlike the traditional isotope effects that originate from the presence of isotopes itself. Hence, the high-temperature ALD is very effective in forming Al2O3 films as a passivation and/or gate-insulation layer of high-temperature-operation diamond SC devices, and the knowledge of the aforementioned new isotope effect will be a basis for further enhancing ALD technologies in general.

  7. High-κ oxide nanoribbons as gate dielectrics for high mobility top-gated graphene transistors

    PubMed Central

    Liao, Lei; Bai, Jingwei; Qu, Yongquan; Lin, Yung-chen; Li, Yujing; Huang, Yu; Duan, Xiangfeng

    2010-01-01

    Deposition of high-κ dielectrics onto graphene is of significant challenge due to the difficulties of nucleating high quality oxide on pristine graphene without introducing defects into the monolayer of carbon lattice. Previous efforts to deposit high-κ dielectrics on graphene often resulted in significant degradation in carrier mobility. Here we report an entirely new strategy to integrate high quality high-κ dielectrics with graphene by first synthesizing freestanding high-κ oxide nanoribbons at high temperature and then transferring them onto graphene at room temperature. We show that single crystalline Al2O3 nanoribbons can be synthesized with excellent dielectric properties. Using such nanoribbons as the gate dielectrics, we have demonstrated top-gated graphene transistors with the highest carrier mobility (up to 23,600 cm2/V·s) reported to date, and a more than 10-fold increase in transconductance compared to the back-gated devices. This method opens a new avenue to integrate high-κ dielectrics on graphene with the preservation of the pristine nature of graphene and high carrier mobility, representing an important step forward to high-performance graphene electronics. PMID:20308584

  8. Divergent dielectric characteristics in cascaded high-K gate stacks with reverse gradient bandgap structures

    NASA Astrophysics Data System (ADS)

    Tsai, Meng-Chen; Cheng, Po-Hsien; Lee, Min-Hung; Lin, Hsin-Chih; Chen, Miin-Jang

    2016-07-01

    The characteristics of cascaded high-K gate stacks with reverse dielectric sequence, TiO2/ZrO2/Al2O3 and Al2O3/ZrO2/ TiO2, on the Si substrate were investigated. The reverse sequence with different gradient bandgap structure gives rise to distinct conduction pathways, resulting in significant divergence of the leakage current density (J g) and the capacitance equivalent thickness (CET). The trapping sites in the high-permittivity TiO2 layer dominate the leakage current paths and strongly impact the conductance and the capacitance of the cascaded high-K gate stacks. Thus, a low CET of 1.05 nm and a low J g of ∼5  ×  10–4 A cm‑2 were achieved due to effective suppression of the leakage current through the traps of TiO2 in the cascaded TiO2/ZrO2/Al2O3 gate stack. In addition, the TiO2 layer gets crystallized in the cascaded TiO2/ZrO2/Al2O3 structure to achieve a higher capacitance because of the intermixing between TiO2 and ZrO2 due to the different reactivity of the precursors for Ti and Zr. This study demonstrates a way to effectively incorporate the high permittivity and low-bandgap materials, such as TiO2, into high-K gate stacks, to further improve device scaling.

  9. The growth of Al2O3/YAG:Ce melt growth composite by the vertical Bridgman technique using an a-axis Al2O3 seed

    NASA Astrophysics Data System (ADS)

    Yoshimura, Masafumi; Sakata, Shin-ichi; Yamada, Seiya; Taishi, Toshinori; Hoshikawa, Keigo

    2015-10-01

    Al2O3/Y3Al5O12 (YAG):Ce melt growth composites (MGCs) were grown by the vertical Bridgman (VB) method using an a-axis [112¯0] Al2O3 seed, and the crystallographic orientations and optical properties of the grown MGCs were investigated. It was found that a crack-free MGC ingot could be grown from the Al2O3 seed. In the MGC grown using the Al2O3 seed, the position of the seeding interface was almost the same to the initial position of the top of the seed. By means of electron backscatter diffraction (EBSD) analysis, it was found that the crystallographic orientation of the Al2O3 phase in the grown MGC corresponded to the a-axis Al2O3 seed, while YAG phases with several different orientations were observed. The light-conversion properties of the MGCs grown using an a axis Al2O3 seed for application to white light emitting diodes (LEDs) were quite similar to those grown using an MGC seed. It was also found that it was possible to grow larger diameter, 2-in., Ce-doped MGC ingots with similar crystallographic properties with the VB method using a small Al2O3 seed.

  10. Unraveling the Origin of Structural Disorder in High Temperature Transition Al2O3: Structure of θ-Al2O3

    SciTech Connect

    Kovarik, Libor; Bowden, Mark E.; Shi, Dachuan; Washton, Nancy M.; Anderson, Amity; Hu, Jian Z.; Lee, Jaekyoung; Szanyi, Janos; Kwak, Ja Hun; Peden, Charles HF

    2015-09-22

    The crystallography of transition Al2O3 has been extensively studied in the past due to the advantageous properties of the oxide in catalytic and a range of other technological applications. However, existing crystallographic models are insufficient to describe the structure of many important Al2O3 polymorphs due to their highly disordered nature. In this work, we investigate structure and disorder in high-temperature treated transition Al2O3, and provide a structural description for θ-Al2O3 by using a suite of complementary imaging, spectroscopy and quantum calculation techniques. Contrary to current understanding, our high-resolution imaging shows that θ-Al2O3 is a disordered composite phase of at least two different end members. By correlating imaging and spectroscopy results with DFT calculations, we propose a model that describes θ-Al2O3 as a disordered intergrowth of two crystallographic variants at the unit cell level. One variant is based on β-Ga2O3, and the other on a monoclinic phase that is closely-related to δ-Al2O3. The overall findings and interpretations afford new insight into the origin of poor crystallinity in transition Al2O3, and also provide new perspectives on structural complexity that can emerge from intergrowth of closely related structural polymorphs.

  11. The thermodynamic properties of hydrated -Al2O3 nanoparticles

    SciTech Connect

    Spencer, Elinor; Huang, Baiyu; Parker, Stewart F.; Kolesnikov, Alexander I; Ross, Dr. Nancy; Woodfield, Brian

    2013-01-01

    In this paper we report a combined calorimetric and inelastic neutron scattering (INS) study of hydrated -Al2O3 ( -alumina) nanoparticles. These complementary techniques have enabled a comprehensive evaluation of the thermodynamic properties of this technological and industrially important metal oxide to be achieved. The isobaric heat capacity (Cp) data presented herein provide further critical insights into the much-debated chemical composition of -alumina nanoparticles. Furthermore, the isochoric heat capacity (Cv) of the surface water, which is so essential to the stability of all metal-oxides at the nanoscale, has been extracted from the high-resolution INS data and differs significantly from that of ice Ih due to the dominating influence of strong surface-water interactions. This study also encompassed the analysis of four -alumina samples with differing pore diameters [4.5 (1), 13.8 (2), 17.9 (3), and 27.2 nm (4)], and the results obtained allow us to unambiguously conclude that the water content and pore size have no influence on the thermodynamic behaviour of hydrated -alumina nanoparticles.

  12. Infrared properties of Pt/Al2O3 cermet films

    NASA Astrophysics Data System (ADS)

    MacMillan, M. F.; Devaty, R. P.; Mantese, J. V.

    1991-06-01

    The room-temperature transmittance and front reflectance of mid- and near-infrared radiation (400-15 000 cm-1) by thin Pt/Al2O3 cermet films prepared by electron-beam evaporation onto sapphire substrates were measured using a Fourier-transform spectrometer. The high value of the dc percolation threshold fc (0.50<=fc<=0.59) for the Pt/Al2O3 system is evidence for correlations in the positions of the particles that can be described by coated-grain topologies. The data were compared with the predictions of five effective-medium models, which feature different microstructural topologies and values of fc. Published data on the dielectric functions of the component materials were used in the modeling. The Maxwell-Garnett and Bruggeman models do not describe the data adequately. A simplified version of a model by Sheng (fc~=0.455) provides an improved description. The best agreement is achieved for two models with adjustable, high values of fc. We conclude that an effective-medium theory is able to describe the infrared optical properties of a cermet system over a wide range of composition if proper account is taken of both the microstructure and the value of fc.

  13. Trapped charge densities in Al2O3-based silicon surface passivation layers

    NASA Astrophysics Data System (ADS)

    Jordan, Paul M.; Simon, Daniel K.; Mikolajick, Thomas; Dirnstorfer, Ingo

    2016-06-01

    In Al2O3-based passivation layers, the formation of fixed charges and trap sites can be strongly influenced by small modifications in the stack layout. Fixed and trapped charge densities are characterized with capacitance voltage profiling and trap spectroscopy by charge injection and sensing, respectively. Al2O3 layers are grown by atomic layer deposition with very thin (˜1 nm) SiO2 or HfO2 interlayers or interface layers. In SiO2/Al2O3 and HfO2/Al2O3 stacks, both fixed charges and trap sites are reduced by at least a factor of 5 compared with the value measured in pure Al2O3. In Al2O3/SiO2/Al2O3 or Al2O3/HfO2/Al2O3 stacks, very high total charge densities of up to 9 × 1012 cm-2 are achieved. These charge densities are described as functions of electrical stress voltage, time, and the Al2O3 layer thickness between silicon and the HfO2 or the SiO2 interlayer. Despite the strong variation of trap sites, all stacks reach very good effective carrier lifetimes of up to 8 and 20 ms on p- and n-type silicon substrates, respectively. Controlling the trap sites in Al2O3 layers opens the possibility to engineer the field-effect passivation in the solar cells.

  14. Properties of slow traps of ALD Al2O3/GeOx/Ge nMOSFETs with plasma post oxidation

    NASA Astrophysics Data System (ADS)

    Ke, M.; Yu, X.; Chang, C.; Takenaka, M.; Takagi, S.

    2016-07-01

    The realization of Ge gate stacks with a small amount of slow trap density as well as thin equivalent oxide thickness and low interface state density (Dit) is a crucial issue for Ge CMOS. In this study, we examine the properties of slow traps, particularly the location of slow traps, of Al2O3/GeOx/n-Ge and HfO2/Al2O3/GeOx/n-Ge MOS interfaces with changing the process and structural parameters, formed by atomic layer deposition (ALD) of Al2O3 and HfO2/Al2O3 combined with plasma post oxidation. It is found that the slow traps can locate in the GeOx interfacial layer, not in the ALD Al2O3 layer. Furthermore, we study the time dependence of channel currents in the Ge n-MOSFETs with 5-nm-thick Al2O3/GeOx/Ge gate stacks, with changing the thickness of GeOx, in order to further clarify the position of slow traps. The time dependence of the current drift and the effective time constant of slow traps do not change among the MOSFETs with the different thickness GeOx, demonstrating that the slow traps mainly exist near the interfaces between Ge and GeOx.

  15. Volatile organic compounds emission control in industrial pollution source using plasma technology coupled with F-TiO2/γ-Al2O3.

    PubMed

    Zhu, Tao; Chen, Rui; Xia, Ni; Li, Xiaoyang; He, Xianxian; Zhao, Wenjuan; Carr, Tim

    2015-01-01

    Volatile organic compounds' (VOCs) effluents, which come from many industries, are triggering serious environmental problems. As an emerging technology, non-thermal plasma (NTP) technology is a potential technology for VOCs emission control. NTP coupled with F-TiO2/γ-Al2O3 is used for toluene removal from a gaseous influent at normal temperature and atmospheric pressure. NTP is generated by dielectric barrier discharge, and F-TiO2/γ-Al2O3 can be prepared by sol-gel method in the laboratory. In the experiment, the different packed materials were packed into the plasma reactor, including γ-Al2O3, TiO2/γ-Al2O3 and F-TiO2/γ-Al2O3. Through a series of characterization methods such as X-ray diffraction, scanning electronic microscopy and Brunner-Emmet-Teller measurements, the results show that the particle size distribution of F-TiO2 is relatively smaller than that of TiO2, and the pore distribution of F-TiO2 is more uniformly distributed than that of TiO2. The relationships among toluene removal efficiency, reactor input energy density, and the equivalent capacitances of air gap and dielectric barrier layer were investigated. The results show that the synergistic technology NTP with F-TiO2/γ-Al2O3 resulted in greater enhancement of toluene removal efficiency and energy efficiency. Especially, when packing with F-TiO2/γ-Al2O3 in NTP reactor, toluene removal efficiency reaches 99% and higher. Based on the data analysis of Fourier Transform Infrared Spectroscopy, the experimental results showed that NTP reactor packed with F-TiO2/γ-Al2O3 resulted in a better inhibition for by-products formation effectively in the gas exhaust. PMID:25428439

  16. Modulus, strength and thermal exposure studies of FP-Al2O3/aluminum and FP-Al2O3/magnesium composites

    NASA Technical Reports Server (NTRS)

    Bhatt, R. T.

    1981-01-01

    The mechanical properties of FP-Al2O3 fiber reinforced composites prepared by liquid infiltration techniques are improved. A strengthening addition, magnesium, was incorporated with the aluminum-lithium matrix alloy usually selected for these composites because of its good wetting characteristics. This ternary composite, FP-Al2O3/Al-(2-3)Li-(3-5)Mg, showed improved transverse strength compared with FP-Al2O3/Al-(2-3)Li composites. The lower axial strengths found for the FP-Al2O3/Al-(2-3)Li-(3-5)Mg composites were attributed to fabrication related defects. Another technique was the use of Ti/B coated FP-Al2O3 fibers in the composites. This coating is readily wet by molten aluminum and permitted the use of more conventional aluminum alloys in the composites. However, the anticipated improvements in the axial and transverse strengths were not obtained due to poor bonding between the fiber coating and the matrix. A third approach studied to improve the strengths of FP-Al2O3 reinforced composites was the use of magnesium alloys as matrix materials. While these alloys wet fibers satisfactorily, the result indicated that the magnesium alloy composites used offered no axial strength or modulus advantage over FP-Al2O3/Al-(2-3)Li composites.

  17. Resistive switching characteristics in memristors with Al2O3/TiO2 and TiO2/Al2O3 bilayers

    NASA Astrophysics Data System (ADS)

    Alekseeva, Liudmila; Nabatame, Toshihide; Chikyow, Toyohiro; Petrov, Anatolii

    2016-08-01

    Differences between the resistive switching characteristics of Al2O3/TiO2 and TiO2/Al2O3 bilayer structures, fabricated by atomic layer deposition at 200 °C and post-deposition annealing, were studied in Pt bottom electrode (Pt-BE)/insulator/Pt top electrode (Pt-TE) capacitors. The Pt-BE/Al2O3/TiO2/Pt-TE capacitor exhibits stable bipolar resistive switching with an on-resistance/off-resistance ratio of ∼102 controlled by a small voltage of ±0.8 V. The forming process occurs in two steps of breaking of the Al2O3 layer and transfer of oxygen vacancies (VO) into the TiO2 layer. The capacitor showed poor endurance, particularly in the high-resistance state under vacuum conditions. This indicates that the insulating TiO2 layer without VO is not formed near the Al2O3 layer because oxygen cannot be introduced from the exterior. On the other hand, in the Pt-BE/TiO2/Al2O3/Pt-TE capacitor, multilevel resistive switching with several applied voltage-dependent nonvolatile states is observed. The switching mechanism corresponds to the Al2O3 layer’s trapped VO concentration, which is controlled by varying the applied voltage.

  18. The MgO-Al2O3-SiO2 system - Free energy of pyrope and Al2O3-enstatite. [in earth mantle formation

    NASA Technical Reports Server (NTRS)

    Saxena, S. K.

    1981-01-01

    The model of fictive ideal components is used to determine Gibbs free energies of formation of pyrope and Al2O3-enstatite from the experimental data on coexisting garnet and orthopyroxene and orthopyroxene and spinel in the temperature range 1200-1600 K. It is noted that Al2O3 forms an ideal solution with MgSiO3. These thermochemical data are found to be consistent with the Al2O3 isopleths that could be drawn using most recent experimental data and with the reversed experimental data on the garnet-spinel field boundary.

  19. Atomic rearrangements in amorphous Al2O3 under electron-beam irradiation

    NASA Astrophysics Data System (ADS)

    Nakamura, R.; Ishimaru, M.; Yasuda, H.; Nakajima, H.

    2013-02-01

    The electron-irradiation-induced crystallization of amorphous Al2O3 (a-Al2O3) was investigated by in-situ transmission electron microscopy under the wide electron-energy region of 25-300 keV. The formation of γ-Al2O3 nanocrystallites was induced by irradiating the a-Al2O3 thin film along with the formation of nanovoids in the crystalline grains regardless of the acceleration voltage. The crystallization became more pronounced with decreasing the electron energy, indicating that electronic excitation processes play a dominant role in the formation of γ-Al2O3. Radial distribution analyses suggested that a-Al2O3 transforms to γ-phase via the "excited" ("stimulated") amorphous state, in which the breaking and rearrangement of unstable short-range Al-O bonds, i.e., fivefold-coordinated Al-O (AlO5) basic units, occur.

  20. Preparation of γ-Al2O3 films by laser chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Gao, Ming; Ito, Akihiko; Goto, Takashi

    2015-06-01

    γ- and α-Al2O3 films were prepared by chemical vapor deposition using CO2, Nd:YAG, and InGaAs lasers to investigate the effects of varying the laser wavelength and deposition conditions on the phase composition and microstructure. The CO2 laser was found to mostly produce α-Al2O3 films, whereas the Nd:YAG and InGaAs lasers produced γ-Al2O3 films when used at a high total pressure. γ-Al2O3 films had a cauliflower-like structure, while the α-Al2O3 films had a dense and columnar structure. Of the three lasers, it was the Nd:YAG laser that interacted most with intermediate gas species. This promoted γ-Al2O3 nucleation in the gas phase at high total pressure, which explains the cauliflower-like structure of nanoparticles observed.

  1. Effective passivation of In0.2Ga0.8As by HfO2 surpassing Al2O3 via in-situ atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Chang, Y. H.; Lin, C. A.; Liu, Y. T.; Chiang, T. H.; Lin, H. Y.; Huang, M. L.; Lin, T. D.; Pi, T. W.; Kwo, J.; Hong, M.

    2012-10-01

    High κ gate dielectrics of HfO2 and Al2O3 were deposited on molecular beam epitaxy-grown In0.2Ga0.8As pristine surface using in-situ atomic-layer-deposition (ALD) without any surface treatment or passivation layer. The ALD-HfO2/p-In0.2Ga0.8As interface showed notable reduction in the interfacial density of states (Dit), deduced from quasi-static capacitance-voltage and conductance-voltage (G-V) at room temperature and 100 °C. More significantly, the midgap peak commonly observed in the Dit(E) of ALD-oxides/In0.2Ga0.8As is now greatly diminished. The midgap Dit value decreases from ≥15 × 1012 eV-1 cm-2 for ALD-Al2O3 to ˜2-4 × 1012 eV-1 cm-2 for ALD-HfO2. Further, thermal stability at 850 °C was achieved in the HfO2/In0.2Ga0.8As, whereas C-V characteristics of Al2O3/p-In0.2Ga0.8As degraded after the high temperature annealing. From in-situ x-ray photoelectron spectra, the AsOx, which is not the oxidized state from the native oxide, but is an induced state from adsorption of trimethylaluminum and H2O, was found at the ALD-Al2O3/In0.2Ga0.8As interface, while that was not detected at the ALD-HfO2/In0.2Ga0.8As interface.

  2. Novel silicon surface passivation by Al2O3/ZnO/Al2O3 films deposited by thermal atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Jeong, Kwang-Seok; Oh, Sung-Kwen; Shin, Hong-Sik; Yun, Ho-Jin; Kim, Seong-Hyeon; Lee, Ho-Ryeong; Han, Kyu-Min; Park, Ho-Yun; Lee, Hi-Deok; Lee, Ga-Won

    2014-01-01

    In this paper, a novel Al2O3/ZnO/Al2O3 stack is proposed as the silicon passivation layer for c-Si solar cell application. Recently, the Al2O3 film has been proved to be effective for passivating the p-type c-Si surface by forming the negative fixed oxide charge. It is confirmed by this experiment that the amount of negative fixed oxide charge can be controlled by inserting a ZnO interlayer (IL), which is explained by acceptor-like defect (VZn, Oi, and OZn) formation determined by the room-temperature photoluminescence (RTPL) analysis. The effect of ZnO IL is investigated using Al2O3 bottom layers of various thicknesses by electrical and physical analyses. The effective lifetime measurement shows that the electronic recombination losses at the silicon surface are reduced effectively by optimizing the Al2O3/ZnO/Al2O3 stack.

  3. The electronic and optical properties of Al2O3, MO, and MAl2O4 (M = Zn, Mg).

    PubMed

    Zhang, Fang-Ying; Zeng, Z; You, J Q

    2010-08-01

    The electronic properties and the imaginary parts of the dielectric function for nanosized ZnAl2O4 and MgAl2O4 are studied compared with those of B4-ZnO, B1-MgO and alpha-Al2O3 using a first-principles pesudopotential plane-wave method. The results show that both the electronic structures and the optical spectra of ZnAl2O4 and MgAl2O4 are different from those of ZnO, MgO and Al2O3 due to the atomic rearrangement, which agrees with the experimental data. The insight mechanism is also discussed. PMID:21125922

  4. Passivation of Al2O3 / TiO2 on monocrystalline Si with relatively low reflectance

    NASA Astrophysics Data System (ADS)

    Lu, Chun-Ti; Huang, Yu-Shiang; Liu, C. W.

    2016-06-01

    Al2O3/TiO2 stack layers deposited by the plasma-enhanced atomic layer deposition enhance photoluminescence intensity by reducing effective surface recombination velocities on both n-type and p-type monocrystalline Si. The field effect of negative oxide charges in the dielectrics is responsible for the low effective surface recombination velocity. The dependence of the effective surface recombination velocity on the photoluminescence intensity is investigated by the 2D numerical simulation. The bilayer stacks without texture also reduce the AM1.5-weighted front side reflectance to 11.8%. The field-effect passivation of Al2O3/TiO2 films is further improved by a forming gas annealing due to the additional increase of the negative oxide charge density.

  5. ALD of Al2O3 for Highly Improved Performance in Li-Ion Batteries

    SciTech Connect

    Dillon, A.; Jung, Y. S.; Ban, C.; Riley, L.; Cavanagh, A.; Yan, Y.; George, S.; Lee, S. H.

    2012-01-01

    Significant advances in energy density, rate capability and safety will be required for the implementation of Li-ion batteries in next generation electric vehicles. We have demonstrated atomic layer deposition (ALD) as a promising method to enable superior cycling performance for a vast variety of battery electrodes. The electrodes range from already demonstrated commercial technologies (cycled under extreme conditions) to new materials that could eventually lead to batteries with higher energy densities. For example, an Al2O3 ALD coating with a thickness of ~ 8 A was able to stabilize the cycling of unexplored MoO3 nanoparticle anodes with a high volume expansion. The ALD coating enabled stable cycling at C/2 with a capacity of ~ 900 mAh/g. Furthermore, rate capability studies showed the ALD-coated electrode maintained a capacity of 600 mAh/g at 5C. For uncoated electrodes it was only possible to observe stable cycling at C/10. Also, we recently reported that a thin ALD Al2O3 coating with a thickness of ~5 A can enable natural graphite (NG) electrodes to exhibit remarkably durable cycling at 50 degrees C. The ALD-coated NG electrodes displayed a 98% capacity retention after 200 charge-discharge cycles. In contrast, bare NG showed a rapid decay. Additionally, Al2O3 ALD films with a thickness of 2 to 4 A have been shown to allow LiCoO2 to exhibit 89% capacity retention after 120 charge-discharge cycles performed up to 4.5 V vs Li/Li+. Bare LiCoO2 rapidly deteriorated in the first few cycles. The capacity fade is likely caused by oxidative decomposition of the electrolyte at higher potentials or perhaps cobalt dissolution. Interestingly, we have recently fabricated full cells of NG and LiCoO2 where we coated both electrodes, one or the other electrode as well as neither electrode. In creating these full cells, we observed some surprising results that lead us to obtain a greater understanding of the ALD coatings. We have also recently coated a binder free LiNi0.04Mn0

  6. In situ metalorganic chemical vapor deposition of Al2O3 on N-face GaN and evidence of polarity induced fixed charge

    NASA Astrophysics Data System (ADS)

    Liu, X.; Kim, J.; Suntrup, D. J.; Wienecke, S.; Tahhan, M.; Yeluri, R.; Chan, S. H.; Lu, J.; Li, H.; Keller, S.; Mishra, U. K.

    2014-06-01

    The in situ metalorganic chemical vapor deposition (MOCVD) of Al2O3 dielectrics on N-face GaN is reported. The near-interface fixed charges are measured by using capacitance-voltage techniques on a metal-oxide-semiconductor (MOSCAP) structure, and the results are compared with those obtained on Ga-face MOSCAPs with the same in situ MOCVD Al2O3 dielectrics. The influence of GaN polarity as well as other possible mechanisms on the formation of fixed charge are identified and discussed.

  7. Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks.

    PubMed

    Xiang, Yuren; Zhou, Chunlan; Jia, Endong; Wang, Wenjing

    2015-01-01

    In order to obtain a good passivation of a silicon surface, more and more stack passivation schemes have been used in high-efficiency silicon solar cell fabrication. In this work, we prepared a-Si:H(i)/Al2O3 stacks on KOH solution-polished n-type solar grade mono-silicon(100) wafers. For the Al2O3 film deposition, both thermal atomic layer deposition (T-ALD) and plasma enhanced atomic layer deposition (PE-ALD) were used. Interface trap density spectra were obtained for Si passivation with a-Si films and a-Si:H(i)/Al2O3 stacks by a non-contact corona C-V technique. After the fabrication of a-Si:H(i)/Al2O3 stacks, the minimum interface trap density was reduced from original 3 × 10(12) to 1 × 10(12) cm(-2) eV(-1), the surface total charge density increased by nearly one order of magnitude for PE-ALD samples and about 0.4 × 10(12) cm(-2) for a T-ALD sample, and the carrier lifetimes increased by a factor of three (from about 10 μs to about 30 μs). Combining these results with an X-ray photoelectron spectroscopy analysis, we discussed the influence of an oxidation precursor for ALD Al2O3 deposition on Al2O3 single layers and a-Si:H(i)/Al2O3 stack surface passivation from field-effect passivation and chemical passivation perspectives. In addition, the influence of the stack fabrication process on the a-Si film structure was also discussed in this study. PMID:25852428

  8. Injection Seeding of Ti:Al2O3 in an unstable resonator theory and experiment

    NASA Technical Reports Server (NTRS)

    Barnes, J. C.; Wang, L. G.; Barnes, N. P.; Edwards, W. C.; Cheng, W. A.; Hess, R. V.; Lockard, G. E.; Ponsardin, P. L.

    1991-01-01

    Injection Seeding of a Ti:Al2O3 unstable resonator using both a pulsed single-mode Ti:Al2O3 laser and a continuous wave laser diode has been characterized. Results are compared with a theory which calculates injection seeding as function of seed and resonator alignment, beam profiles, and power.

  9. Metastability in the MgAl2O4-Al2O3 System

    DOE PAGESBeta

    Wilkerson, Kelley R.; Smith, Jeffrey D.; Hemrick, James G.

    2014-07-22

    Aluminum oxide must take a spinel form ( γ-Al2O3) at elevated temperatures in order for extensive solid solution to form between MgAl2O4 and α-Al2O3. The solvus line between MgAl2O4 and Al2O3 has been defined at 79.6 wt% Al2O3 at 1500°C, 83.0 wt% Al2O3 at 1600°C, and 86.5 wt% Al2O3 at 1700°C. A metastable region has been defined at temperatures up to 1700°C which could have significant implications for material processing and properties. Additionally, initial processing could have major implications on final chemistry. The spinel solid solution region has been extended to form an infinite solid solution with Al2O3 at elevatedmore » temperatures. A minimum in melting at 1975°C and a chemistry of 96 wt% Al2O3 rather than a eutectic is present, resulting in no eutectic crystal formation during solidification.« less

  10. Sinterability, mechanical, and electrical properties of Al2O3/8YSZ nanocomposites prepared by ultrasonic spray pyrolysis.

    PubMed

    Yang, Jae-Kyo; Shim, Kwang-Bo; Kim, Hee-Taik; Choa, Yong-Ho

    2006-11-01

    Al2O3 nanoparticles added the YSZ for improving the mechanical property and the ionic conductivity. Al2O3/YSZ nanocomposites were prepared by ultrasonic spray pyrolysis and PECS process. The relative density of the Al2O3/YSZ nanocomposites was fully densified at a sintering temperature of 1100 degrees C. The grain size for 5 vol.% Al2O3/YSZ was less than 100 nm. The fracture toughness and total ionic conductivity of Al2O3/YSZ nanocomposites were improved compared with Al2O3/YSZ nanocomposites by conventional process, due to homogeneous dispersion and uniform particle size of added Al2O3. PMID:17252776

  11. Influence of Al2O3 sol concentration on the microstructure and mechanical properties of Cu-Al2O3 composite coatings

    NASA Astrophysics Data System (ADS)

    Wei, Xiaojin; Yang, Zhendi; Tang, Ying; Gao, Wei

    2015-03-01

    Copper (Cu) is widely used as electrical conducting and contacting material. However, Cu is soft and does not have good mechanical properties. In order to improve the hardness and wear resistance of Cu, sol-enhanced Cu-Al2O3 nanocomposite coatings were electroplated by adding a transparent Al oxide (Al2O3) sol into the traditional electroplating Cu solution. It was found that the microstructure and mechanical properties of the nanocomposite coatings were largely influenced by the Al2O3 sol concentration. The results show that the Al2O3 nanoparticle reinforced the composite coatings, resulting in significantly improved hardness and wear resistance in comparison with the pure Cu coatings. The coating prepared at the sol concentration of 3.93 mol/L had the best microhardness and wear resistance. The microhardness has been improved by 20% from 145.5 HV (Vickers hardness number) of pure Cu coating to 173.3 HV of Cu-Al2O3 composite coatings. The wear resistance was also improved by 84%, with the wear volume loss dropped from 3.2 × 10-3 mm3 of Cu coating to 0.52 × 10-3 mm3 of composite coatings. Adding excessive sol to the electrolyte deteriorated the properties.

  12. Formation of gamma'-Ni3Al via the Peritectoid Reaction: gamma plus beta (+Al2O3) equals gamma'(+Al2O3)

    NASA Technical Reports Server (NTRS)

    Copland, Evan

    2008-01-01

    The activities of Al and Ni were measured using multi-cell Knudsen effusion-cell mass spectrometry (multi-cell KEMS), over the composition range 8 - 32 at.%Al and temperature range T = 1400 - 1750 K in the Ni-Al-O system. These measurements establish that equilibrium solidification of gamma'-Ni3Al-containing alloys occurs by the eutectic reaction, L (+ Al2O3) = gamma + beta (+ Al2O3), at 1640 plus or minus 1 K and a liquid composition of 24.8 plus or minus 0.2 at.%Al (at an unknown oxygen content). The {gamma + beta + Al2O3} phase field is stable over the temperature range 1633 - 1640 K, and gamma'-Ni3Al forms via the peritectiod, gamma + beta (+ Al2O3) = gamma'(+ Al2O3), at 1633 plus or minus 1 K. This behavior is inconsistent with the current Ni-Al phase diagram and a new diagram is proposed. This new Ni-Al phase diagram explains a number of unusual steady state solidification structures reported previously and provides a much simpler reaction scheme in the vicinity of the gamma'-Ni3Al phase field.

  13. Formation of gamma(sup prime)-Ni3Al via the Peritectoid Reaction: gamma + beta (+ Al2O3)=gamma(sup prime)(+ Al2O3)

    NASA Technical Reports Server (NTRS)

    Copeland, Evan

    2008-01-01

    The activities of Al and Ni were measured using multi-cell Knudsen effusion-cell mass spectrometry (multi-cell KEMS), over the composition range 8-32 at.%Al and temperature range T=1400-1750 K in the Ni-Al-O system. These measurements establish that equilibrium solidification of gamma(sup prime)-Ni3Al-containing alloys occurs by the eutectic reaction, L (+ Al2O3)=gamma + Beta(+ Al2O3), at 1640 +/- 1 K and a liquid composition of 24.8 +/- 0.2 at.%al (at an unknown oxygen content). The {gamma + Beta (+Al2O3} phase field is stable over the temperature range 1633-1640 K, and gamma(sup prime)-Ni3Al forms via the peritectoid, gamma + Beta (+ Al2O3)=gamma(sup prime) (+ Al2O3), at 1633 +/- 1 K. This behavior is consistent with the current Ni-Al phase diagram and a new diagram is proposed. This new Ni-Al phase diagram explains a number of unusual steady-state solidification structures reported previously and provides a much simpler reaction scheme in the vicinity of the gamma(sup prime)-Ni2Al phase field.

  14. Thermal Properties in the MgAl2O4-Al2O3 System

    SciTech Connect

    Wilkerson, Dr. Kelley R.; Smith, Jeffrey D; Hemrick, James Gordon

    2013-01-01

    Compositional effects on the thermal diffusivity in the MgAl2O4-Al2O3 system were studied. The lowest thermal diffusivity, 0.0258 +/-5% cm/s, was measured between 79.8 and 83.9 wt% Al2O3 quenched from various temperatures between 1500 and 1700C. All of the chemistries in this range extend past the solvus, but still form a singe super-saturated spinel solid solution, regardless of quenching tempeature. A super-saturated metastable solid solution region was observed at 1500, 1600, and 1700C extending to 83.9, 85.2, and 87.1 wt% Al2O3, respectively. Beyond 83.9% Al2O3 a significant increase in thermal diffusivity, 11.7%, was observed and its attributed to precipiation of Al2O3 through spinodal decomposition.

  15. Effects of Al2O3 phase and Cl component on dehydrogenation of propane

    NASA Astrophysics Data System (ADS)

    Liu, Jie; Liu, Changcheng; Ma, Aizeng; Rong, Junfeng; Da, Zhijian; Zheng, Aiguo; Qin, Ling

    2016-04-01

    The effects of two Al2O3 phases, γ- and θ-Al2O3, and Cl component on the performances of Pt-Al2O3 catalysts in the dehydrogenation of propane were investigated in this work. The catalysts were systematically characterized by various techniques, such as scanning transmission electron microscopy (STEM), temperature-programmed desorption with ammonia as probe molecules (NH3-TPD) and temperature-programmed oxidation (TPO). The characterizations and catalytic results show that: (i) the pore structures and acid properties of the two Al2O3 phases can change the quantity, location and property of the carbon deposition, (ii) the existence of Cl plays a significant role on the agglomeration of Pt particles and carbon deposition, which further influence the catalytic performances of Pt-Al2O3 catalysts with different support phases for propane dehydrogenation.

  16. Negative permittivity behavior in Fe50Ni50/Al2O3 magnetic composite near percolation threshold

    NASA Astrophysics Data System (ADS)

    Chen, Min; Fan, Run-hua; Gao, Meng; Pan, Shi-bing; Yu, Ming-xun; Zhang, Zi-dong

    2015-05-01

    The physical properties of conductor-insulator composites often take dramatic changes near the percolation threshold (fc), leading to interesting applications, such as double negative material. This phenomenon also will be enlarged by increasing the differences between the properties of the constitutive phases. In this paper, the Fe50Ni50/Al2O3 magnetic cermets with different Fe50Ni50 volume contents (10%, 20%, 30%, 40%) were prepared via hot-pressing sintering. The permittivity of Fe50Ni50/Al2O3 composites has been studied in the radio frequency range. The results indicate that when the Fe50Ni50 content is below fc, the reactance of the composites takes a negative value, which indicates a capacitive character. The metallic Fe50Ni50 grains are isolated in the insulating ceramic matrix, leading to an insulator-like dielectric property. When the volume fraction of Fe50Ni50 reaches 40% which is above fc, the composites manifest an inductive character. In this case, the negative permittivity has been obtained over the whole test frequency range due to the percolation phenomenon, which makes Fe50Ni50/Al2O3 composites as promising candidates for double negative materials.

  17. Stoichiometry of the ALD-Al2O3/4H–SiC interface by synchrotron-based XPS

    NASA Astrophysics Data System (ADS)

    Usman, Muhammad; Saveda Suvanam, Sethu; Ghadami Yazdi, Milad; Göthelid, Mats; Sultan, Muhammad; Hallén, Anders

    2016-06-01

    The interface of Al2O3 with 4H-SiC is investigated with synchrotron-based high-resolution x-ray photoelectron spectroscopy to clarify the effect of post-dielectric deposition annealing processes (rapid thermal annealing (RTA) and furnace annealing (FA)) involved in device fabrication. Our results show that post-deposition annealing of Al2O3/4H-SiC up to 1100 °C forms a thin interfacial layer of SiO2 between Al2O3 and SiC, which possibly improves the dielectric properties of the system by reducing oxide charges and near-interface traps. Moreover, the formation of SiO2 at the interface gives additional band offset to the dielectric system. We have also observed that the RTA and FA processes have similar results at a high temperature of 1100 °C. Therefore, we propose that high-temperature post-oxide (Al2O3) deposition annealing of up to 1100 °C may be used in device processing, which can improve overall dielectric properties and consequently the device performance.

  18. Structural and Superconducting Properties of (Al2O3) y /CuTl-1223 Composites

    NASA Astrophysics Data System (ADS)

    Jabbar, Abdul; Qasim, Irfan; Waqee-ur-Rehman, M.; Zaman, Munawar; Nadeem, K.; Mumtaz, M.

    2015-01-01

    The effects of nano-Alumina (Al2O3) particles inclusion on the structural and superconducting transport properties of (Cu0.5Tl0.5)Ba2Ca2Cu3O10-δ (CuTl-1223) matrix were explored in detail. Different concentrations (i.e. y = 0-1.5 wt.%) of Al2O3 nanoparticles were added to a CuTl-1223 matrix to obtain the desired (Al2O3) y /CuTl-1223 nano-superconducting composites. No significant change was observed in the crystal structure and stoichiometry of the host CuTl-1223 superconducting phase after the addition of Al2O3 nanoparticles. This indicates the occupancy of these nanoparticles at the inter-granular spaces. The superconductivity was suppressed with increasing Al2O3 nanoparticles contents in the CuTl-1223 matrix. The suppression of superconducting properties is most probably due to a pair-breaking mechanism caused by the reflection/scattering of carriers across the insulating nano-Al2O3 particles present at the grain boundaries. The non-monotonic variation of the superconducting properties may be due to inhomogeneous distribution of Al2O3 nanoparticles at the grain boundaries.

  19. Pinhole Effect on the Melting Behavior of Ag@Al2O3 SERS Substrates.

    PubMed

    Ma, Lingwei; Huang, Yu; Hou, Mengjing; Li, Jianghao; Zhang, Zhengjun

    2016-12-01

    High-temperature surface-enhanced Raman scattering (SERS) sensing is significant for practical detections, and pinhole-containing (PC) metal@oxide structures possessing both enhanced thermal stability and superior SERS sensitivity are served as promising SERS sensors at extreme sensing conditions. Through tuning the Al2O3 precursors' exposure time during atomic layer deposition (ALD), Al2O3 shells with different amount of pinholes were covered over Ag nanorods (Ag NRs). By virtue of these unique PC Ag@Al2O3 nanostructures, herein we provide an excellent platform to investigate the relationship between the pinhole rate of Al2O3 shells and the melting behavior, high-temperature SERS performances of these core-shell nanostructures. Pinhole effect on the melting procedures of PC Ag@Al2O3 substrates was characterized in situ via their reflectivity variations during heating, and the specific melting point was quantitatively estimated. It is found that the melting point of PC Ag@Al2O3 raised along with the decrement of pinhole rate, and substrates with less pinholes exhibited better thermal stability but sacrificed SERS efficiency. This work achieved highly reliable and precise control of the pinholes over Al2O3 shells, offering sensitive SERS substrates with intensified thermal stability and superior SERS performances at extreme sensing conditions. PMID:27033846

  20. Catalytic ozonation of petroleum refinery wastewater utilizing Mn-Fe-Cu/Al2O 3 catalyst.

    PubMed

    Chen, Chunmao; Yoza, Brandon A; Wang, Yandan; Wang, Ping; Li, Qing X; Guo, Shaohui; Yan, Guangxu

    2015-04-01

    There is of great interest to develop an economic and high-efficient catalytic ozonation system (COS) for the treatment of biologically refractory wastewaters. Applications of COS require options of commercially feasible catalysts. Experiments in the present study were designed to prepare and investigate a novel manganese-iron-copper oxide-supported alumina-assisted COS (Mn-Fe-Cu/Al2O3-COS) for the pretreatment of petroleum refinery wastewater. The highly dispersed composite metal oxides on the catalyst surface greatly promoted the performance of catalytic ozonation. Hydroxyl radical mediated oxidation is a dominant reaction in Mn-Fe-Cu/Al2O3-COS. Mn-Fe-Cu/Al2O3-COS enhanced COD removal by 32.7% compared with a single ozonation system and by 8-16% compared with Mn-Fe/Al2O3-COS, Mn-Cu/Al2O3-COS, and Fe-Cu/Al2O3-COS. The O/C and H/C ratios of oxygen-containing polar compounds significantly increased after catalytic ozonation, and the biodegradability of petroleum refinery wastewater was significantly improved. This study illustrates potential applications of Mn-Fe-Cu/Al2O3-COS for pretreatment of biologically refractory wastewaters. PMID:25649390

  1. Pinhole Effect on the Melting Behavior of Ag@Al2O3 SERS Substrates

    NASA Astrophysics Data System (ADS)

    Ma, Lingwei; Huang, Yu; Hou, Mengjing; Li, Jianghao; Zhang, Zhengjun

    2016-03-01

    High-temperature surface-enhanced Raman scattering (SERS) sensing is significant for practical detections, and pinhole-containing (PC) metal@oxide structures possessing both enhanced thermal stability and superior SERS sensitivity are served as promising SERS sensors at extreme sensing conditions. Through tuning the Al2O3 precursors' exposure time during atomic layer deposition (ALD), Al2O3 shells with different amount of pinholes were covered over Ag nanorods (Ag NRs). By virtue of these unique PC Ag@Al2O3 nanostructures, herein we provide an excellent platform to investigate the relationship between the pinhole rate of Al2O3 shells and the melting behavior, high-temperature SERS performances of these core-shell nanostructures. Pinhole effect on the melting procedures of PC Ag@Al2O3 substrates was characterized in situ via their reflectivity variations during heating, and the specific melting point was quantitatively estimated. It is found that the melting point of PC Ag@Al2O3 raised along with the decrement of pinhole rate, and substrates with less pinholes exhibited better thermal stability but sacrificed SERS efficiency. This work achieved highly reliable and precise control of the pinholes over Al2O3 shells, offering sensitive SERS substrates with intensified thermal stability and superior SERS performances at extreme sensing conditions.

  2. Vacuum ultraviolet thin films. I - Optical constants of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2, and SiO2 thin films. II - Vacuum ultraviolet all-dielectric narrowband filters

    NASA Technical Reports Server (NTRS)

    Zukic, Muamer; Torr, Douglas G.; Spann, James F.; Torr, Marsha R.

    1990-01-01

    An iteration process matching calculated and measured reflectance and transmittance values in the 120-230 nm VUV region is presently used to ascertain the optical constants of bulk MgF2, as well as films of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2, and SiO2 deposited on MgF2 substrates. In the second part of this work, a design concept is demonstrated for two filters, employing rapidly changing extinction coefficients, centered at 135 nm for BaF2 and 141 nm for SiO2. These filters are shown to yield excellent narrowband spectral performance in combination with narrowband reflection filters.

  3. Impacts of Annealing Conditions on the Flat Band Voltage of Alternate La2O3/Al2O3 Multilayer Stack Structures.

    PubMed

    Feng, Xing-Yao; Liu, Hong-Xia; Wang, Xing; Zhao, Lu; Fei, Chen-Xi; Liu, He-Lei

    2016-12-01

    The mechanism of flat band voltage (VFB) shift for alternate La2O3/Al2O3 multilayer stack structures in different annealing condition is investigated. The samples were prepared for alternate multilayer structures, which were annealed in different conditions. The capacitance-voltage (C-V) measuring results indicate that the VFB of samples shift negatively for thinner bottom Al2O3 layer, increasing annealing temperature or longer annealing duration. Simultaneously, the diffusion of high-k material to interfaces in different multilayer structures and annealing conditions is observed by X-ray photoelectron spectroscopy (XPS). Based on the dipole theory, a correlation between the diffusion effect of La towards bottom Al2O3/Si interface and VFB shift is found. Without changing the dielectric constant k of films, VFB shift can be manipulated by controlling the single-layer cycles and annealing conditions of alternate high-k multilayer stack. PMID:27620192

  4. Effects of HCl treatment and predeposition vacuum annealing on Al2O3/GaSb/GaAs metal-oxide-semiconductor structures

    NASA Astrophysics Data System (ADS)

    Gotow, Takahiro; Fujikawa, Sachie; Fujishiro, Hiroki I.; Ogura, Mutsuo; Yasuda, Tetsuji; Maeda, Tatsuro

    2015-02-01

    The effects of HCl treatment and predeposition vacuum annealing (VA) on n-type GaSb/GaAs metal-oxide-semiconductor (MOS) structures with the atomic layer deposition (ALD) of Al2O3 dielectrics are studied. We obtained MOS structures with good Fermi level modulation by HCl treatment prior to the deposition of Al2O3. From X-ray photoelectron spectroscopy (XPS) analysis, we found that the Ga2O3 content increases during the Al2O3 deposition, whereas the amounts of Sb components are reduced. The excess growth of Ga2O3 is inhibited by the reductions in the amounts of Sb components by the HCl treatment. Further reductions in the amounts of Sb components are observed following predeposition VA, indicating a lower density of states (Dit). However, the frequency dispersion in the capacitance-voltage (C-V) characteristics increases with predeposition VA at higher temperatures.

  5. Atomic layer deposition of Al2O3 on germanium-tin (GeSn) and impact of wet chemical surface pre-treatment

    NASA Astrophysics Data System (ADS)

    Gupta, Suyog; Chen, Robert; Harris, James S.; Saraswat, Krishna C.

    2013-12-01

    GeSn is quickly emerging as a potential candidate for high performance Si-compatible transistor technology. Fabrication of high-ĸ gate stacks on GeSn with good interface properties is essential for realizing high performance field effect transistors based on this material system. We demonstrate an effective surface passivation scheme for n-Ge0.97Sn0.03 alloy using atomic layer deposition (ALD) of Al2O3. The effect of pre-ALD wet chemical surface treatment is analyzed and shown to be critical in obtaining a good quality interface between GeSn and Al2O3. Using proper surface pre-treatment, mid-gap trap density for the Al2O3/GeSn interface of the order of 1012 cm-2 has been achieved.

  6. Thermoluminescence studies of γ-irradiated Al2O3:Ce3+ phosphor

    NASA Astrophysics Data System (ADS)

    Reddy, S. Satyanarayana; Nagabhushana, K. R.; Singh, Fouran

    2016-07-01

    Pure and Ce3+ doped Al2O3 phosphors were synthesized by solution combustion method. The synthesized samples were characterized by X-ray diffraction (XRD) and its shows α-phase of Al2O3. Crystallite size was estimated by Williamson-Hall (W-H) method and found to be 49, 59 and 84 nm for pure, 0.1 mol% and 1 mol% Ce3+ doped Al2O3 respectively. Trace elemental analysis of undoped Al2O3 shows impurities viz. Fe, Cr, Mn, Mg, Ti, etc. Photoluminescence (PL) spectra of Al2O3:Ce3+ shows emission at 367 nm and excitation peak at 273 nm, which are corresponding to 5D → 4F and 4F → 5D transitions respectively. PL intensity decreases with concentration up to 0.4 mol%, beyond this mol% PL intensity increases with doping concentration up to 2 mol%. Thermoluminescence (TL) studies of γ-rayed pure and Ce3+ doped Al2O3 have been studied. Two well resolved TL glow peaks at 457.5 K and 622 K were observed in pure Al2O3. Additional glow peak at 566 K was observed in Al2O3:Ce3+. Maximum TL intensity was observed for Al2O3:Ce3+ (0.1 mol%) beyond this TL intensity decreases with increasing Ce3+ concentration. Computerized glow curve deconvolution (CGCD) method was used to resolve the multiple peaks and to calculate TL kinetic parameters. Thermoluminescence emission (TLE) spectra of pure Al2O3 glow peaks (457.5 K and 622 K) shows sharp emission at 694 nm and two small humps at 672 nm and 709 nm. The sharp peak at 696 nm corresponds to Cr3+ impurity of 2Eg → 4A2g transition of R lines and 713 nm hump is undoubtedly belongs to Cr3+ emission of near neighbor pairs. The emission at 672 nm is characteristic of Mn4+ impurity ions of 2E → 4A2 transition. TLE of Al2O3:Ce3+ (0.1 mol%) shows additional broad emission at 412 nm corresponds to F-centers. Linearity is observed in the dose range 20-500 Gy in Al2O3:Ce3+ (1 mol%).

  7. Synthesis and optical studies of chemically synthesized PPy/Al2O3 nanocomposites

    NASA Astrophysics Data System (ADS)

    Bahadur, Indra; Mishra, Sheo K.; Tripathi, Akhilesh; Shukla, R. K.

    2016-05-01

    In the present work, we have synthesised pure and 2wt% Al2O3 doped PPy by the chemical oxidation method. XRD patterns of 2wt% Al2O3 doped PPy shows several broad peaks while pure PPy shows only one single peak indicating poor crystalline phase of PPy. FTIR spectra confirm the formation of PPy and also suggest that doping of Al2O3 in PPy does not affect its structure. PL shows several emission peaks for both samples located at ˜365 nm with two shoulders at ˜473 nm and ˜533 nm. The further synthesis and properties study is under investigation.

  8. Optical properties of the Al2O3/SiO2 and Al2O3/HfO2/SiO2 antireflective coatings

    NASA Astrophysics Data System (ADS)

    Marszałek, Konstanty; Winkowski, Paweł; Jaglarz, Janusz

    2014-01-01

    Investigations of bilayer and trilayer Al2O3/SiO2 and Al2O3/HfO2/SiO2 antireflective coatings are presented in this paper. The oxide films were deposited on a heated quartz glass by e-gun evaporation in a vacuum of 5 × 10-3 [Pa] in the presence of oxygen. Depositions were performed at three different temperatures of the substrates: 100 °C, 200 °C and 300 °C. The coatings were deposited onto optical quartz glass (Corning HPFS). The thickness and deposition rate were controlled with Inficon XTC/2 thickness measuring system. Deposition rate was equal to 0.6 nm/s for Al2O3, 0.6 nm - 0.8 nm/s for HfO2 and 0.6 nm/s for SiO2. Simulations leading to optimization of the thin film thickness and the experimental results of optical measurements, which were carried out during and after the deposition process, have been presented. The optical thickness values, obtained from the measurements performed during the deposition process were as follows: 78 nm/78 nm for Al2O3/SiO2 and 78 nm/156 nm/78 nm for Al2O3/HfO2/SiO2. The results were then checked by ellipsometric technique. Reflectance of the films depended on the substrate temperature during the deposition process. Starting from 240 nm to the beginning of visible region, the average reflectance of the trilayer system was below 1 % and for the bilayer, minima of the reflectance were equal to 1.6 %, 1.15 % and 0.8 % for deposition temperatures of 100 °C, 200 °C and 300 °C, respectively.

  9. First-principles elastic constants of α- and θ-Al2O3

    NASA Astrophysics Data System (ADS)

    Shang, Shunli; Wang, Yi; Liu, Zi-Kui

    2007-03-01

    Using an efficient strain-stress method, the first-principles elastic constants cij's of α-Al2O3 and θ-Al2O3 have been predicted within the local density approximation and the generalized gradient approximation. It is indicated that more accurate calculations of cij's can be accomplished by the local density approximation. The predicted cij's of θ-Al2O3 provide helpful guidance for future measurements, especially the predicted negative c15. The present results make the stress estimation in thermally grown oxides containing of α- and θ-Al2O3 possible, which in turn provide helpful insights for preventing the failure of thermal barrier coatings on components in gas-turbine engines.

  10. Feasibility study of plasma sprayed Al2O3 coatings as diffusion barrier on CFC components

    NASA Astrophysics Data System (ADS)

    Bobzin, Kirsten; Zhao, Lidong; Kopp, Nils; Warda, Thomas

    2012-12-01

    Carbon fibre reinforced carbon (CFC) materials are increasingly applied as sample carriers in modern furnaces. Only their tendency to react with different metals at high temperatures by C-diffusion is a disadvantage, which can be solved by application of diffusion barriers. Within this study the feasibility of plasma sprayed Al2O3 coatings as diffusion barrier was studied. Al2O3 coatings were prepared by air plasma spraying (APS). The coatings were investigated in terms of their microstructure, bonding to CFC substrates and thermal stability. The results showed that Al2O3 could be well deposited onto CFC substrates. The coatings had a good bonding and thermal shock behavior at 1060°C. At higher temperature of 1270°C, crack network formed within the coating, showing that the plasma sprayed Al2O3 coatings are limited regarding to their application temperatures as diffusion barrier on CFC components.

  11. Oxidation of Al2O3 continuous fiber-reinforced/NiAl composites

    NASA Technical Reports Server (NTRS)

    Doychak, J.; Nesbitt, J. A.; Noebe, R. D.; Bowman, R. R.

    1992-01-01

    The 1200 C and 1300 C isothermal and cyclic oxidation behavior of Al2O3 continuous fiber-reinforced/NiAl composites were studied. Oxidation resulted in formation of Al2O3 external scales in a similar manner as scales formed on monolithic NiAl. The isothermal oxidation of an Al2O3/NiAl composite resulted in oxidation of the matrix along the fiber/matrix interface near the fiber ends. This oxide acted as a wedge between the fiber and the matrix, and, under cyclic oxidation conditions, led to further oxidation along the fiber lengths and eventual cracking of the composite. The oxidation behavior of composites in which the Al2O3 fibers were sputter coated with nickel prior to processing was much more severe. This was attributed to open channels around the fibers which formed during processing, most likely as a result of the diffusion of the nickel coating into the matrix.

  12. Fabrication of Al2O3/glass/Cf Composite Substrate with High Thermal Conductivity

    NASA Astrophysics Data System (ADS)

    Wang, S. X.; Liu, G. S.; Ouyang, X. Q.; Wang, Y. D.; Zhang, D.

    2016-02-01

    In this paper, carbon fiber with high thermal conductivity was introduced into the alumina-based composites. To avoid oriented alignment of carbon fibers (Cf) and carbothermal reactions during the sintering process, the Al2O3/glass/Cf substrate was hot-pressed under a segmental-pressure procedure at 1123 K. Experimental results show that carbon fibers randomly distribute and form a bridging structure in the matrix. The three-dimensional network of Cf in Al2O3/glass/Cf substrate brings excellent heat conducting performance due to the heat conduction by electrons. The thermal conductivity of Al2O3/30%glass/30%Cf is as high as 28.98 W mK-1, which is 4.56 times larger than that of Al2O3/30%glass.

  13. Determination of transmission factors for beta radiation using Al 2O 3:C commercial OSL dosimeters

    NASA Astrophysics Data System (ADS)

    Pinto, T. N. O.; Caldas, L. V. E.

    2010-07-01

    In recent years, the optically stimulated luminescence (OSL) technique has been used in personal dosimetry, and aluminum oxide (Al 2O 3:C) has become a very useful material for this technique. The objective of this work was the determination of the transmission factors for beta radiation using Al 2O 3:C commercial dosimeters and the OSL method. The obtained results were similar to the transmission factors reported in the beta source calibration certificates.

  14. Sodium ion diffusion in Al2O3: a distinct perspective compared with lithium ion diffusion.

    PubMed

    Jung, Sung Chul; Kim, Hyung-Jin; Choi, Jang Wook; Han, Young-Kyu

    2014-11-12

    Surface coating of active materials has been one of the most effective strategies to mitigate undesirable side reactions and thereby improve the overall battery performance. In this direction, aluminum oxide (Al2O3) is one of the most widely adopted coating materials due to its easy synthesis and low material cost. Nevertheless, the effect of Al2O3 coating on carrier ion diffusion has been investigated mainly for Li ion batteries, and the corresponding understanding for emerging Na ion batteries is currently missing. Using ab initio molecular dynamics calculations, herein, we first find that, unlike lithiation, sodiation of Al2O3 is thermodynamically unfavorable. Nonetheless, there can still exist a threshold in the Na ion content in Al2O3 before further diffusion into the adjacent active material, delivering a new insight that both thermodynamics and kinetics should be taken into account to describe ionic diffusion in any material media. Furthermore, Na ion diffusivity in NaxAl2O3 turns out to be much higher than Li ion diffusivity in LixAl2O3, a result opposite to the conventional stereotype based on the atomic radius consideration. While hopping between the O-rich trapping sites via an Na-O bond breaking/making process is identified as the main Na ion diffusion mechanism, the weaker Na-O bond strength than the Li-O counterpart turns out to be the origin of the superior diffusivity of Na ions. PMID:25286155

  15. Postperovskite phase equilibria in the MgSiO3-Al2O3 system.

    PubMed

    Tsuchiya, Jun; Tsuchiya, Taku

    2008-12-01

    We investigate high-P,T phase equilibria of the MgSiO(3)-Al(2)O(3) system by means of the density functional ab initio computation methods with multiconfiguration sampling. Being different from earlier studies based on the static substitution properties with no consideration of Rh(2)O(3)(II) phase, present calculations demonstrate that (i) dissolving Al(2)O(3) tends to decrease the postperovskite transition pressure of MgSiO(3) but the effect is not significant ( approximately -0.2 GPa/mol% Al(2)O(3)); (ii) Al(2)O(3) produces the narrow perovskite+postperovskite coexisting P,T area (approximately 1 GPa) for the pyrolitic concentration (x(Al2O3) approximately 6 mol%), which is sufficiently responsible to the deep-mantle D'' seismic discontinuity; (iii) the transition would be smeared (approximately 4 GPa) for the basaltic Al-rich composition (x(Al2O3) approximately 20 mol%), which is still seismically visible unless iron has significant effects; and last (iv) the perovskite structure spontaneously changes to the Rh(2)O(3)(II) with increasing the Al concentration involving small displacements of the Mg-site cations. PMID:19036928

  16. Influence of annealing temperature on the phase transformation of Al2O3

    NASA Astrophysics Data System (ADS)

    Mahat, Annie Maria; Mastuli, Mohd Sufri; Kamarulzaman, Norlida

    2016-02-01

    In the present study, Al2O3 powders were prepared via a self-propagating combustion method using citric acid as a combustion agent. Effects of annealing temperature on the phase transformation of the prepared powders were studied on samples annealed at 800 °C and 1000 °C. The Al2O3 samples were characterized using X-Ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and N2 adsorption-desorption measurements. The XRD results showed that pure η-phase and pure α-phase of Al2O3 were obtained at 800 °C and 1000 °C, respectively. Their crystallite sizes are totally different as can be seen clearly from the FESEM micrographs. The η-Al2O3 sample annealed at low temperature has crystallite size smaller than 10 nm compared to the α-Al2O3 sample annealed at higher temperature which has crystallites from few microns to hundreds microns in size. From the BET (Brunauer-Emmett-Teller) method, the specific surface area for both samples are 59.4 m2g-1 and 3.1 m2g-1, respectively. It is proposed that the annealing temperature less pronounced for the morphology, but, it is significant for the phase transitions as well as the size and the specific surface area of the Al2O3 samples.

  17. Reactive Plasma Spraying of Fine Al2O3/AlN Feedstock Powder

    NASA Astrophysics Data System (ADS)

    Shahien, Mohammed; Yamada, Motohiro; Yasui, Toshiaki; Fukumoto, Masahiro

    2013-12-01

    Reactive plasma spraying (RPS) is a promising technology for in situ formation of aluminum nitride (AlN) coatings. Recently, AlN-based coatings were fabricated by RPS of alumina (Al2O3) powder in N2/H2 thermal plasma. This study investigated the feasibility of RPS of a fine Al2O3/AlN mixture and the influence of the plasma gases (N2, H2) on the nitriding conversion, and coating microstructure and properties. Thick AlN/Al2O3 coatings with high nitride content were successfully fabricated. The coatings consist of h-AlN, c-AlN, Al5O6N, γ-Al2O3, and a small amount of α-Al2O3. Use of fine particles enhanced the nitriding conversion and the melting tendency by increasing the surface area. Furthermore, the AlN additive improved the AlN content in the coatings. Increasing the N2 gas flow rate improved the nitride content and complete crystal growth to the h-AlN phase, and enhanced the coating thickness. On the other hand, though the H2 gas is required for plasma nitriding of the Al2O3 particles, increasing its flow rate decreased the nitride content and the coating thickness. Remarkable influence of the plasma gases on the coating composition, microstructure, and properties was observed during RPS of the fine particles.

  18. Investigation of hybrid plasma-catalytic removal of acetone over CuO/γ-Al2O3 catalysts using response surface method.

    PubMed

    Zhu, Xinbo; Tu, Xin; Mei, Danhua; Zheng, Chenghang; Zhou, Jinsong; Gao, Xiang; Luo, Zhongyang; Ni, Mingjiang; Cen, Kefa

    2016-07-01

    In this work, plasma-catalytic removal of low concentrations of acetone over CuO/γ-Al2O3 catalysts was carried out in a cylindrical dielectric barrier discharge (DBD) reactor. The combination of plasma and the CuO/γ-Al2O3 catalysts significantly enhanced the removal efficiency of acetone compared to the plasma process using the pure γ-Al2O3 support, with the 5.0 wt% CuO/γ-Al2O3 catalyst exhibiting the best acetone removal efficiency of 67.9%. Catalyst characterization was carried out to understand the effect the catalyst properties had on the activity of the CuO/γ-Al2O3 catalysts in the plasma-catalytic reaction. The results indicated that the formation of surface oxygen species on the surface of the catalysts was crucial for the oxidation of acetone in the plasma-catalytic reaction. The effects that various operating parameters (discharge power, flow rate and initial concentration of acetone) and the interactions between these parameters had on the performance of the plasma-catalytic removal of acetone over the 5.0 wt% CuO/γ-Al2O3 catalyst were investigated using central composite design (CCD). The significance of the independent variables and their interactions were evaluated by means of the Analysis of Variance (ANOVA). The results showed that the gas flow rate was the most significant factor affecting the removal efficiency of acetone, whilst the initial concentration of acetone played the most important role in determining the energy efficiency of the plasma-catalytic process. PMID:27093635

  19. Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications.

    PubMed

    Wang, Lai-Guo; Qian, Xu; Cao, Yan-Qiang; Cao, Zheng-Yi; Fang, Guo-Yong; Li, Ai-Dong; Wu, Di

    2015-01-01

    We have demonstrated a flexible resistive random access memory unit with trilayer structure by atomic layer deposition (ALD). The device unit is composed of Al2O3/HfO2/Al2O3-based functional stacks on TiN-coated Si substrate. The cross-sectional HRTEM image and XPS depth profile of Al2O3/HfO2/Al2O3 on TiN-coated Si confirm the existence of interfacial layers between trilayer structures of Al2O3/HfO2/Al2O3 after 600°C post-annealing. The memory units of Pt/Al2O3/HfO2/Al2O3/TiN/Si exhibit a typical bipolar, reliable, and reproducible resistive switching behavior, such as stable resistance ratio (>10) of OFF/ON states, sharp distribution of set and reset voltages, better switching endurance up to 10(3) cycles, and longer data retention at 85°C over 10 years. The possible switching mechanism of trilayer structure of Al2O3/HfO2/Al2O3 has been proposed. The trilayer structure device units of Al2O3/HfO2/Al2O3 on TiN-coated Si prepared by ALD may be a potential candidate for oxide-based resistive random access memory. PMID:25852426

  20. Molecular Layer-seeded Ultra-thin Top-gate Dielectrics for High Transconductance Graphene Transistors

    NASA Astrophysics Data System (ADS)

    Sangwan, Vinod; Jariwala, Deep; Karmel, Hunter; Alaboson, Justice; Lauhon, Lincoln; Marks, Tobin; Hersam, Mark

    2012-02-01

    The potential of graphene in integrated analog and digital circuits can only be fully realized through incorporation of ultra-thin gate dielectrics to enable large-scale small-channel graphene field-effect transistors (GFETs). Atomic-layer deposition (ALD) is a viable technique to fabricate gate-dielectrics, however, it requires a seeding layer on otherwise inert graphene. Here, we demonstrate a single molecule thick perylene-3,4,9,10-tetracarboxylic dianhydride overlayer as an effective seeding layer to grow high-κ Al2O3 on mechanically exfoliated graphene for high-performance GFETs. Using an ultra-thin (< 1nm) seeding layer, in contrast to polymer films (5-10 nm), we demonstrate fabrication of the thinnest ALD-grown gate-dielectric (4 nm) reported to date in top-gated GFETs. This yields high performance GFETs with the intrinsic transconductance parameter approaching 2.4 mS and the field-effect mobility ˜3000 cm^2/Vs. We also demonstrate generalization of this molecular layer seeded-ALD growth method to higher- κ gate dielectrics, yielding further enhanced GFET transconductance for possible application to radio-frequency circuits.

  1. The chemisorption of H2O, HCOOH and CH3COOH on thin amorphous films of Al2O3

    NASA Technical Reports Server (NTRS)

    Lewis, B. F.; Weinberg, W. H.; Mosesman, M.

    1974-01-01

    Investigation of the irreversible chemisorption of water, formic acid and acetic acid on a thin amorphous aluminum oxide film, using inelastic tunneling spectroscopy. All of the tunnel junctions employed were Al-Al2O3-Pb junctions with the adsorbate on the Al2O3 surface between the Al2O3 and the Pb electrode. The results obtained include the finding that all Al2O3 surfaces prepared by oxidation of Al have free CH groups present on them.

  2. Super Smooth Modification of Al2O3 Ceramic Substrate by High Temperature Glaze of CaO-Al2O3-SiO2 System

    NASA Astrophysics Data System (ADS)

    Zhang, Jihua; Zhen, Shanxue; Yang, Lijun; Lou, Feizhi; Chen, Hongwei; Yang, Chuanren

    2011-01-01

    The rough surface of ceramic substrate is an obstacle for the scale down of line-width for thin film passive integrated devices (PID). In this paper, a modification method for Al2O3 ceramic substrate with super smooth in surface was proposed. Coating a layer of CaO-Al2O3-SiO2 (CAS) glass was performed to flat the rough surface of alumina substrate by sol-gel method. It was found that addition of 0.06% V2O5 can inhibit the recrystallization of the glaze. The root-mean-square (RMS) roughness of the glazed substrates reached a surprising flatness as small as 0.5 nm, and its melting temperature is higher than 1300 °C. This substrate with super flatness and high temperature endurance may be promising for high performance thin film devices.

  3. Atomic layer controlled deposition of Al 2O 3 films using binary reaction sequence chemistry

    NASA Astrophysics Data System (ADS)

    Ott, A. W.; McCarley, K. C.; Klaus, J. W.; Way, J. D.; George, S. M.

    1996-11-01

    Al 2O 3 films with precise thicknesses and high conformality were deposited using sequential surface chemical reactions. To achieve this controlled deposition, a binary reaction for Al 2O 3 chemical vapor deposition (2Al(CH 3) 3 + 3H 2O → Al 2O 3 + 6CH 4) was separated into two half-reactions: (A) AlOH ∗ + Al(CH 3) 3 → AlOAl(CH 3) 2∗ + CH 4, (B) AlCH 3∗ + H 2O → AlOH ∗ + CH 4, where the asterisks designate the surface species. Trimethylaluminum (Al(CH 3) 3) (TMA) and H 2O reactants were employed alternately in an ABAB … binary reaction sequence to deposit Al 2O 3 films on single-crystal Si(100) and porous alumina membranes with pore diameters of ˜ 220 Å. Ellipsometric measurements obtained a growth rate of 1.1 Å/AB cycle on the Si(100) substrate at the optimal reaction conditions. The Al 2O 3 films had an index of refraction of n = 1.65 that is consistent with a film density of ϱ = 3.50 g/cm 3. Atomic force microscope images revealed that the Al 2O 3 films were exceptionally flat with a surface roughness of only ±3 Å ( rms) after the deposition of ˜ 270 Å using 250 AB reaction cycles. Al 2O 3 films were also deposited inside the pores of Anodisc alumina membranes. Gas flux measurements for H 2 and N 2 were consistent with a progressive pore reduction versus number of AB reaction cycles. Porosimetry measurements also showed that the original pore diameter of ˜ 220 Å was reduced to ˜ 130 Å after 120 AB reaction cycles.

  4. Dissolutive Wetting and Spreading Phenomena Between Al2O3 Substrate and CaO-Al2O3 Liquid Slags

    NASA Astrophysics Data System (ADS)

    Kim, Seonjin; Lee, Kyuyong; Chung, Yongsug

    2016-04-01

    The wetting and spreading behavior are influenced by the dissolution reaction. The wetting and spreading behavior between CaO-Al2O3 slag and Al2O3 substrate were investigated using the dispensed drop technique and a high speed camera (1000 frame/s) at 1823 K (1550 °C) using saturated slag and non-saturated slag on Al2O3. The contact angle of the saturated slag and the non-saturated slag was not substantially different. The apparent height of the spreading droplet for the non-saturated slag was lower than that of the saturated slag due to the formation of a crater generated by the dissolution reaction. A spherical cap model is associated with crater formation was suggested by analyzing the spread droplet and a quenched sample. The spreading rate of the non-saturated slag was faster than that of the saturated slag due to convection. For the saturated slag, the experimental values are in good agreement with the De Gennes's theoretical model. (Non-reactive viscous model) In contrast, the non-saturated slag curve shifts the experimental curve to correspond with the saturated slag curve.

  5. Interface Engineering for Atomic Layer Deposited Alumina Gate Dielectric on SiGe Substrates.

    PubMed

    Zhang, Liangliang; Guo, Yuzheng; Hassan, Vinayak Vishwanath; Tang, Kechao; Foad, Majeed A; Woicik, Joseph C; Pianetta, Piero; Robertson, John; McIntyre, Paul C

    2016-07-27

    Optimization of the interface between high-k dielectrics and SiGe substrates is a challenging topic due to the complexity arising from the coexistence of Si and Ge interfacial oxides. Defective high-k/SiGe interfaces limit future applications of SiGe as a channel material for electronic devices. In this paper, we identify the surface layer structure of as-received SiGe and Al2O3/SiGe structures based on soft and hard X-ray photoelectron spectroscopy. As-received SiGe substrates have native SiOx/GeOx surface layers, where the GeOx-rich layer is beneath a SiOx-rich surface. Silicon oxide regrows on the SiGe surface during Al2O3 atomic layer deposition, and both SiOx and GeOx regrow during forming gas anneal in the presence of a Pt gate metal. The resulting mixed SiOx-GeOx interface layer causes large interface trap densities (Dit) due to distorted Ge-O bonds across the interface. In contrast, we observe that oxygen-scavenging Al top gates decompose the underlying SiOx/GeOx, in a selective fashion, leaving an ultrathin SiOx interfacial layer that exhibits dramatically reduced Dit. PMID:27345195

  6. Interface states in Al2O3/AlGaN/GaN metal-oxide-semiconductor structure by frequency dependent conductance technique

    NASA Astrophysics Data System (ADS)

    Liao, Xue-Yang; Zhang, Kai; Zeng, Chang; Zheng, Xue-Feng; En, Yun-Fei; Lai, Ping; Hao, Yue

    2014-05-01

    Frequency dependent conductance measurements are implemented to investigate the interface states in Al2O3/AlGaN/GaN metal-oxide-semiconductor (MOS) structures. Two types of device structures, namely, the recessed gate structure (RGS) and the normal gate structure (NGS), are studied in the experiment. Interface trap parameters including trap density Dit, trap time constant τit, and trap state energy ET in both devices have been determined. Furthermore, the obtained results demonstrate that the gate recess process can induce extra traps with shallower energy levels at the Al2O3/AlGaN interface due to the damage on the surface of the AlGaN barrier layer resulting from reactive ion etching (RIE).

  7. Mechanical and morphological properties of polypropylene/nano α-Al2O3 composites.

    PubMed

    Mirjalili, F; Chuah, L; Salahi, E

    2014-01-01

    A nanocomposite containing polypropylene (PP) and nano α-Al2O3 particles was prepared using a Haake internal mixer. Mechanical tests, such as tensile and flexural tests, showed that mechanical properties of the composite were enhanced by addition of nano α-Al2O3 particles and dispersant agent to the polymer. Tensile strength was approximately ∼ 16% higher than pure PP by increasing the nano α-Al2O3 loading from 1 to 4 wt% into the PP matrix. The results of flexural analysis indicated that the maximum values of flexural strength and flexural modulus for nanocomposite without dispersant were 50.5 and 1954 MPa and for nanocomposite with dispersant were 55.88 MPa and 2818 MPa, respectively. However, higher concentration of nano α-Al2O3 loading resulted in reduction of those mechanical properties that could be due to agglomeration of nano α-Al2O3 particles. Transmission and scanning electron microscopic observations of the nanocomposites also showed that fracture surface became rougher by increasing the content of filler loading from 1 to 4% wt. PMID:24688421

  8. (100) facets of γ-Al2O3: the active surfaces for alcohol dehydration reactions

    SciTech Connect

    Kwak, Ja Hun; Mei, Donghai; Peden, Charles HF; Rousseau, Roger J.; Szanyi, Janos

    2011-05-01

    Temperature programmed desorption (TPD) of ethanol, and methanol dehydration reaction were studied on γ-Al2O3 in order to identify the catalytic active sites for alcohol dehydration reactions. Two high temperature (> 473 K) desorption features were observed following ethanol adsorption. Samples calcined at T≤473 K displayed a desorption feature in the 523-533 K temperature range, while those calcined at T ≥ 673 K showed a single desorption feature at 498 K. The switch from the high to low temperature ethanol desorption correlated well with the dehydroxylation of the (100) facets of γ-Al2O3 that was predicted at 550 K DFT calculations. Theoretical DFT simulations of the mechanism of dehydration. on clean and hydroxylated γ-Al2O3(100) surfaces, find that a concerted elimination of ethylene from an ethanol molecule chemisorbed at an Al3+ pentacoordinated site is the rate limiting step for catalytic cycle on both surfaces. Furthermore, titration of the pentacoordinate Al3+ sites on the (100) facets of γ-Al2O3 by BaO completely turned off the methanol dehydration reaction activity. These results unambiguously demonstrate that only the (100) facets on γ-Al2O3 are the catalytic active surfaces for alcohol dehydration.

  9. Mechanical and Morphological Properties of Polypropylene/Nano α-Al2O3 Composites

    PubMed Central

    Mirjalili, F.; Chuah, L.; Salahi, E.

    2014-01-01

    A nanocomposite containing polypropylene (PP) and nano α-Al2O3 particles was prepared using a Haake internal mixer. Mechanical tests, such as tensile and flexural tests, showed that mechanical properties of the composite were enhanced by addition of nano α-Al2O3 particles and dispersant agent to the polymer. Tensile strength was approximately ∼16% higher than pure PP by increasing the nano α-Al2O3 loading from 1 to 4 wt% into the PP matrix. The results of flexural analysis indicated that the maximum values of flexural strength and flexural modulus for nanocomposite without dispersant were 50.5 and 1954 MPa and for nanocomposite with dispersant were 55.88 MPa and 2818 MPa, respectively. However, higher concentration of nano α-Al2O3 loading resulted in reduction of those mechanical properties that could be due to agglomeration of nano α-Al2O3 particles. Transmission and scanning electron microscopic observations of the nanocomposites also showed that fracture surface became rougher by increasing the content of filler loading from 1 to 4% wt. PMID:24688421

  10. Photochemistry of the α-Al2O3-PETN interface

    DOE PAGESBeta

    Tsyshevsky, Roman V.; Zverev, Anton; Mitrofanov, Anatoly; Rashkeev, Sergey N.; Kuklja, Maija M.

    2016-02-29

    Optical absorption measurements are combined with electronic structure calculations to explore photochemistry of an α-Al2O3-PETN interface formed by a nitroester (pentaerythritol tetranitrate, PETN, C5H8N4O12) and a wide band gap aluminum oxide (α-Al2O3) substrate. The first principles modeling is used to deconstruct and interpret the α-Al2O3-PETN absorption spectrum that has distinct peaks attributed to surface F0-centers and surfacePETN transitions. We predict the low energy α-Al2O3 F0-centerPETN transition, producing the excited triplet state, and α-Al2O3 F-0-centerPETN charge transfer, generating the PETN anion radical. This implies that irradiation by commonly used lasers can easily initiate photodecomposition of both excited and charged PETN atmore » the interface. As a result, the feasible mechanism of the photodecomposition is proposed.« less

  11. Synthesis, biocompatibility and mechanical properties of ZrO2-Al2O3 ceramics composites.

    PubMed

    Nevarez-Rascon, Alfredo; González-Lopez, Santiago; Acosta-Torres, Laura Susana; Nevarez-Rascon, Martina Margarita; Orrantia-Borunda, Erasmo

    2016-01-01

    This study evaluated cell viability, microhardness and flexural strength of two ceramic composites systems (ZA and AZ), pure alumina and zirconia. There were prepared homogeneous mixtures of 78wt%Al2O3+20wt%3Y-TZP+2wt%Al2O3w (AZ) and 80wt%3YTZP+18wt%Al2O3+2wt%Al2O3w (ZA), as well as 3Y-TZP (Z), pure Al2O3 (A) and commercial monolithic 3Y-TZP (Zc). Also mouse fibroblast cells 3T3-L1 and a MTT test was carried out at 24, 48 and 72 h. The surfaces were observed with SEM and the microhardness and three-point flexural strength values were estimated. The absolute microhardness values were: A>AZ>Z>Zc>ZA. Flexural strength of Zc, Z, and ZA were around double than AZ and A. All groups showed high biocompatibility trough cell viability values at 24, 48 and 72 h. Factors like grain shape, grain size and homogeneous or heterogeneous grain distributions may play an important role in physical, mechanical and biological properties of the ceramic composites. PMID:27251994

  12. In situ Formed α-Al2O3 Nanocrystals Repaired the Preexisting Microcracks in Plasma-Sprayed Al2O3 Coating via Stress-Induced Phase Transformation

    NASA Astrophysics Data System (ADS)

    Yang, Kai; Feng, Jingwei; Rong, Jian; Liu, Chenguang; Tao, Shunyan; Ding, Chuanxian

    2016-02-01

    In the present study, the phase composition and generation mechanism of the nanocrystals located in the microcracks of plasma-sprayed Al2O3 coating were reevaluated. The Al2O3 coatings were investigated using transmission electron microscopy and x-ray diffraction. We supply the detailed explanations to support the new viewpoint that in situ formation of α-Al2O3 nanocrystals in the preexisting microcracks of the as-sprayed Al2O3 coating may be due to the stress-induced phase transformation. Owing to the partially coherent relationship, the phase interfaces between the α-Al2O3 nanocrystals with the preferred orientation and the γ-Al2O3 matrix may possess better bonding strength. The α-Al2O3 nanocrystals could repair the microcracks in the coating, which further strengthens grain boundaries. Grain boundary strengthening is beneficial to the coating fracture toughness enhancement.

  13. Ionic conductivity and thermoelectric power of pure and Al2O3-dispersed AgI

    NASA Technical Reports Server (NTRS)

    Shahi, K.; Wagner, J. B., Jr.

    1981-01-01

    Ionic and electronic conductivities, and thermoelectric power have been measured for AgI and AgI containing a dispersion of submicron size Al2O3 particles. While the dispersion of Al2O3 enhances the ionic conductivity significantly, it does not affect the electronic properties of the matrix. The enhancement is a strong function of the size and concentration of the dispersoid. Various models have been tested to account for the enhanced conduction. However, the complex behavior of the present results points out the need for more sophisticated theoretical models. Ionic conduction and thermoelectric power data suggest that the dispersed Al2O3 generates an excess of cation vacancies and thereby enhances the conductivity and suppresses the thermoelectric power of the matrix. The individual heats of transport of cation interstitials and vacancies have been estimated and compared to their respective migration energies.

  14. Glycerol Steam Reforming Over Ni-Fe-Ce/Al2O3 Catalyst: Effect of Cerium.

    PubMed

    Go, Gwang-Sub; Go, Yoo-Jin; Lee, Hong-Joo; Moon, Dong-Ju; Park, Nam-Cook; Kim, Young-Chul

    2016-02-01

    In this work, hydrogen production from glycerol by steam reforming was studied using Ni-metal oxide catalysts. Ni-based catalyst becomes deactivated during steam reforming reactions because of coke deposits and sintering. Therefore, the aim of this study was to reduce carbon deposits and sintering on the catalyst surface by adding a promoter. Ni-metal oxide catalysts supported on Al2O3 were prepared via impregnation method, and the calcined catalyst was reduced under H2 flow for 2 h prior to the reaction. The characteristics of the catalysts were examined by XRD, TPR, TGA, and SEM. The Ni-Fe-Ce/Al2O3 catalyst, which contained less than 2 wt% Ce, showed the highest hydrogen selectivity and glycerol conversion. Further analysis of the catalysts revealed that the Ni-Fe-Ce/Al2O3 catalyst required a lower reduction temperature and produced minimum carbon deposit. PMID:27433687

  15. Nondestructive depth profile of the chemical state of ultrathin Al2O3/Si interface

    NASA Astrophysics Data System (ADS)

    Lee, Jong Cheol; Oh, S.-J.

    2004-05-01

    We investigated a depth profile of the chemical states of an Al2O3/Si interface using nondestructive photon energy-dependent high-resolution x-ray photoelectron spectroscopy (HRXPS). The Si 2p binding energy, attributed to the oxide interfacial layer (OIL), was found to shift from 102.1 eV to 102.9 eV as the OIL region closer to Al2O3 layer was sampled, while the Al 2p binding energy remains the same. This fact strongly suggests that the chemical state of the interfacial layer is not Al silicate as previously believed. We instead propose from the HRXPS of Al 2p and Si 2p depth-profile studies that the chemical states of the Al2O3/Si interface mainly consist of SiO2 and Si2O3.

  16. Optical and x-ray photoelectron spectroscopy studies of α-Al2O3

    NASA Astrophysics Data System (ADS)

    Prakash, Ram; Kumar, Sandeep; Kumar, Vinay; Choudhary, R. J.; Phase, D. M.

    2016-05-01

    α-Al2O3 powder sample was synthesized at 550 °C via solution combustion synthesis (SCS) method using urea as an organic fuel. The sample was characterized by X-ray diffraction (XRD), Optical spectroscopy and X-ray photoelectron spectroscopy (XPS) without any further thermal treatment. XRD study reveals that the powder crystallized directly in the hexagons α-Al2O3 phase. A band gap of 5.7 eV was estimated using diffuse reflectance spectra. For surface investigation X-ray photo electron spectroscopy (XPS) was carried out. The XPS survey scan study of α-Al2O3 powder reveals that the sample is free from impurity. The core levels of Al-2s and O-1s are also reported.

  17. Thermal stability of atomic layer deposition Al2O3 film on HgCdTe

    NASA Astrophysics Data System (ADS)

    Zhang, P.; Sun, C. H.; Zhang, Y.; Chen, X.; He, K.; Chen, Y. Y.; Ye, Z. H.

    2015-06-01

    Thermal stability of Atomic Layer Deposition Al2O3 film on HgCdTe was investigated by Al2O3 film post-deposition annealing treatment and Metal-Insulator-Semiconductor device low-temperature baking treatment. The effectiveness of Al2O3 film was evaluated by measuring the minority carrier lifetime and capacitance versus voltage characteristics. After annealing treatment, the minority carrier lifetime of the HgCdTe sample presented a slight decrease. Furthermore, the fixed charge density and the slow charge density decreased significantly in the annealed MIS device. After baking treatment, the fixed charge density and the slow charge density of the unannealed and annealed MIS devices decreased and increased, respectively.

  18. Growth of highly oriented γ- and α-Al2O3 thin films by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Balakrishnan, G.; Babu, R. Venkatesh; Shin, K. S.; Song, J. I.

    2014-03-01

    Highly oriented aluminum oxide (Al2O3) thin films were grown on SrTiO3 (100), α-Al2O3 (11¯02), α-Al2O3 (0001) and MgO (100) single crystal substrates at an optimized oxygen partial pressure of 3.5×10-3 mbar and 700 °C by pulsed laser deposition. The films were characterized by X-ray diffraction and atomic force microscopy. The X-ray diffraction studies indicated the highly oriented growth of γ-Al2O3 (400) ǁ SrTiO3 (100), α-Al2O3 (024) ǁ α-Al2O3 (11¯02), α-Al2O3 (006) ǁ α-Al2O3 (0001) and α-Al2O3 (006) ǁ MgO (100). Formation of nanostructures with dense and smooth surface morphology was observed using atomic force microscopy. The root mean square surface roughness of the films were 0.2 nm, 0.5 nm, 0.7 nm and 0.3 nm on SrTiO3 (100), α-Al2O3 (11¯02), α-Al2O3 (0001) and MgO (100) substrates, respectively.

  19. Effect of AL2O3 and TiO2 nanoparticles on aquatic organisms

    NASA Astrophysics Data System (ADS)

    Gosteva, I.; Morgalev, Yu; Morgaleva, T.; Morgalev, S.

    2015-11-01

    Environmental toxicity of aqueous disperse systems of nanoparticles of binary compounds of titanium dioxides (with particle size Δ50=5 nm, Δ50=50 nm, Δ50=90 nm), aluminum oxide alpha-forms (Δ50=7 nm and Δ50=70 nm) and macro forms (TiO2 Δ50=350 nm, Al2O3 A50=4000 nm) were studied using biological testing methods. The bioassay was performed using a set of test organisms representing the major trophic levels. We found the dependence of the toxic effect concentration degree of nTiO2 and nAl2O3 on the fluorescence of the bacterial biosensor "Ekolyum", the chemotactic response of ciliates Paramecium caudatum, the growth of unicellular algae Chlorella vulgaris Beijer and mortality of entomostracans Daphnia magna Straus. We revealed the selective dependence of nTiO2 and nAl2O3 toxicity on the size, concentration and chemical nature of nanoparticles. The minimal concentration causing an organism's response on nTiO2 and nAl2O3 effect depends on the type of the test- organism and the test reaction under study. We specified L(E)C50 and acute toxicity categories for all the studied nanoparticles. We determined that nTiO2 (Δ50=5 nm) belong to the category «Acute toxicity 1», nTiO2 (A50=90 nm) and nAl2O3 (Δ50=70 nm) - to the category «Acute toxicity 2», nAl2O3 (Δ50=7 nm) - to the category «Acute toxicity 3». No acute toxicity was registered for nTiO2 (Δ50=50 nm) and macro form TiO2.

  20. Rapid fabrication of Al2O3 encapsulations for organic electronic devices

    NASA Astrophysics Data System (ADS)

    Ali, Kamran; Ali, Junaid; Mehdi, Syed Murtuza; Choi, Kyung-Hyun; An, Young Jin

    2015-10-01

    Organic electronics have earned great reputation in electronic industry yet they suffer technical challenges such as short lifetimes and low reliability because of their susceptibility to water vapor and oxygen which causes their fast degradation. This paper report on the rapid fabrication of Al2O3 encapsulations through a unique roll-to-roll atmospheric atomic layer deposition technology (R2R-AALD) for the life time enhancement of organic poly (4-vinylphenol) (PVP) memristor devices. The devices were then categorized into two sets. One was processed with R2R-AALD Al2O3 encapsulations at 50 °C and the other one was kept as un-encapsulated. The field-emission scanning electron microscopy (FESEM) results revealed that pin holes and other irregularities in PVP films with average arithmetic roughness (Ra) of 9.66 nm have been effectively covered by Al2O3 encapsulation having Ra of 0.92 nm. The X-ray photoelectron spectroscopy XPS spectrum for PVP film showed peaks of C 1s and O 1s at the binding energies of 285 eV and 531 eV, respectively. The respective appearance of Al 2p, Al 2s, and O 1s peaks at the binding energies of 74 eV, 119 eV, and 531 eV, confirms the fabrication of Al2O3 films. Electrical current-voltage (I-V) measurements confirmed that the Al2O3 encapsulation has a huge influence on the performance, robustness and life time of memristor devices. The Al2O3 encapsulated memristor performed with superior stability for four weeks whereas the un-encapsulated devices could only last for one week. The performance of encapsulated device had been promising after being subjected to bending test for 100 cycles and the variations in its stability were of minor concern confirming the mechanical robustness and flexibility of the devices.

  1. Reactive Plasma Nitriding of AL2O3 Powder in Thermal Spray

    NASA Astrophysics Data System (ADS)

    Shahien, Mohammed; Yamada, Motohiro; Yasui, Toshiaki; Fukumoto, Masahiro

    Among advanced ceramics, aluminum nitride (AlN) had attracted much attention in the field of electrical and structural applications due to its outstanding properties. However, it is difficult to fabricate AlN coating by conventional thermal spray processes directly. Due to the thermal decomposition of feedstock AlN powder during spraying without a stable melting phase (which is required for deposition in thermal spray). Reactive plasma spraying (RPS) has been considered as a promising technology for in-situ formation of AlN thermally sprayed coatings. In this study the possibility of fabrication of AlN coating by reactive plasma nitriding of alumina (Al2O3) powder using N2/H2 plasma was investigated. It was possible to fabricate a cubic-AlN (c-AlN) based coating and the fabricated coating consists of c-AlN, α-Al2O3, Al5O6N and γ-Al2O3. It was difficult to understand the nitriding process from the fabricated coatings. Therefore, the Al2O3 powders were sprayed and collected in water. The microstructure observation of the collected powder and its cross section indicate that the reaction started from the surface. Thus, the sprayed particles were melted and reacted in high temperature reactive plasma and formed aluminum oxynitride which has cubic structure and easily nitride to c-AlN. During the coatings process the particles collide, flatten, and rapidly solidified on a substrate surface. The rapid solidification on the substrate surface due to the high quenching rate of the plasma flame prevents AlN crystal growth to form the hexagonal phase. Therefore, it was possible to fabricate c-AlN/Al2O3 based coatings through reactive plasma nitriding reaction of Al2O3 powder in thermal spray.

  2. High Temperature Aerogels in the Al2O3-SiO2 System

    NASA Technical Reports Server (NTRS)

    Hurwitz, Frances I.; Aranda, Denisse V.; Gallagher, Meghan E.

    2008-01-01

    Al2O3-SiO2 aerogels are of interest as constituents of thermal insulation systems for use at high temperatures. Al2O3 and mullite aerogels are expected to crystallize at higher temperatures than their SiO2 counterparts, hence avoiding the shrinkages that accompany the formation of lower temperature SiO2 phases and preserving pore structures into higher temperature regimes. The objective of this work is to determine the influence of processing parameters on shrinkage, gel structure (including surface area, pore size and distribution) and pyrolysis behavior.

  3. Admittance and subthreshold characteristics of atomic-layer-deposition Al2O3 on In0.53Ga0.47As in surface and buried channel flatband metal-oxide-semiconductor field effect transistors

    NASA Astrophysics Data System (ADS)

    Paterson, G. W.; Bentley, S. J.; Holland, M. C.; Thayne, I. G.; Ahn, J.; Long, R. D.; McIntyre, P. C.; Long, A. R.

    2012-05-01

    The admittances and subthreshold characteristics of capacitors and MOSFETs on buried and surface In0.53Ga0.47As channel flatband wafers, with a dielectric of Al2O3 deposited on In0.53Ga0.47As, are reported. The admittance characteristics of both wafers indicate the presence of defect states within the oxide, in common with a number of other oxides on In0.53Ga0.47As. The two wafers studied have not been hydrogen annealed, but do show some similar features to FGA treated oxides on n+ substrates. We discuss how the possible presence of residual hydroxyl ions in as-grown Al2O3 may explain these similarities and also account for many of the changes in the properties of FGA treated n+ samples. The issues around the comparison of subthreshold swing (SS) results and the impact of transistor design parameters on the energy portion of the defect state distribution affecting efficient device switching are discussed. The interface state model is applied to low source-drain voltage SS data to extract an effective interface state density (Dit) that includes interface and oxide traps. The logarithmic gate voltage sweep rate dependence of the SS Dit is used to extract an oxide trap density (Dot) and a simple method is used to estimate the Fermi level position within the band gap, Et. The Al2O3 Dit(Et) and Dot(Et) distributions are found to be similar to each other and to the results of our analysis of Gd0.25Ga0.15O0.6/Ga2O3 and HfO2/Al2O3 on In0.53Ga0.47As, adding weight to the suggestion of there being a common defect state distribution and perhaps a common cause of defects states for a number of oxides on In0.53Ga0.47As.

  4. The Influence of Al2O3 Powder Morphology on the Properties of Cu-Al2O3 Composites Designed for Functionally Graded Materials (FGM)

    NASA Astrophysics Data System (ADS)

    Strojny-Nędza, Agata; Pietrzak, Katarzyna; Węglewski, Witold

    2016-07-01

    In order to meet the requirements of an increased efficiency applying to modern devices and in more general terms science and technology, it is necessary to develop new materials. Combining various types of materials (such as metals and ceramics) and developing composite materials seem to be suitable solutions. One of the most interesting materials includes Cu-Al2O3 composite and gradient materials (FGMs). Due to their potential properties, copper-alumina composites could be used in aerospace industry as rocket thrusters and components in aircraft engines. The main challenge posed by copper matrix composites reinforced by aluminum oxide particles is obtaining the uniform structure with no residual porosity (existing within the area of the ceramic phase). In the present paper, Cu-Al2O3 composites (also in a gradient form) with 1, 3, and 5 vol.% of aluminum oxide were fabricated by the hot pressing and spark plasma sintering methods. Two forms of aluminum oxide (αAl2O3 powder and electrocorundum) were used as a reinforcement. Microstructural investigations revealed that near fully dense materials with low porosity and a clear interface between the metal matrix and ceramics were obtained in the case of the SPS method. In this paper, the properties (mechanical, thermal, and tribological) of composite materials were also collected and compared. Technological tests were preceded by finite element method analyses of thermal stresses generated in the gradient structure, and additionally, the role of porosity in the formation process of composite properties was modeled. Based on the said modeling, technological conditions for obtaining FGMs were proposed.

  5. Atomic layer deposition of highly-doped Er:Al2O3 and Tm:Al2O3 for silicon-based waveguide amplifiers (Conference Presentation)

    NASA Astrophysics Data System (ADS)

    Roenn, John; Karvonen, Lasse; Pyymäki-Perros, Alexander; Peyghambarian, Nasser; Lipsanen, Harri; Säynätjoki, Antti; Sun, Zhipei

    2016-05-01

    Recently, rare-earth doped waveguide amplifiers (REDWAs) have drawn significant attention as a promising solution to on-chip amplification of light in silicon photonics and integrated optics by virtue of their high excited state lifetime (up to 10 ms) and broad emission spectrum (up to 200 nm) at infrared wavelengths. In the family of rare-earths, at least erbium, holmium, thulium, neodymium and ytterbium have been demonstrated to be good candidates for amplifier operation at moderate concentrations (< 0.1 %). However, efficient amplifier operation in REDWAs is a very challenging task because high concentration of ions (<0.1%) is required in order to produce reasonable amplification over short device length. Inevitably, high concentration of ions leads to energy-transfer between neighboring ions, which results as decreased gain and increased noise in the amplifier system. It has been shown that these energy-transfer mechanisms in highly-doped gain media are inversely proportional to the sixth power of the distance between the ions. Therefore, novel fabrication techniques with the ability to control the distribution of the rare-earth ions within the gain medium are urgently needed in order to fabricate REDWAs with high efficiency and low noise. Here, we show that atomic layer deposition (ALD) is an excellent technique to fabricate highly-doped (<1%) RE:Al2O3 gain materials by using its nanoscale engineering ability to delicately control the incorporation of RE ions during the deposition. In our experiment, we fabricated Er:Al2O3 and Tm:Al2O3 thin films with ALD by varying the concentration of RE ions from 1% to 7%. By measuring the photoluminescence response of the fabricated samples, we demonstrate that it is possible to incorporate up to 5% of either Er- or Tm-ions in Al2O3 host before severe quenching occurs. We believe that this technique can be extended to other RE ions as well. Therefore, our results show the exceptionality of ALD as a deposition technique for

  6. Fabrication and characterization of Al2O3 /Si composite nanodome structures for high efficiency crystalline Si thin film solar cells

    NASA Astrophysics Data System (ADS)

    Zhang, Ruiying; Zhu, Jian; Zhang, Zhen; Wang, Yanyan; Qiu, Bocang; Liu, Xuehua; Zhang, Jinping; Zhang, Yi; Fang, Qi; Ren, Zhong; Bai, Yu

    2015-12-01

    We report on our fabrication and characterization of Al2O3/Si composite nanodome (CND) structures, which is composed of Si nanodome structures with a conformal cladding Al2O3 layer to evaluate its optical and electrical performance when it is applied to thin film solar cells. It has been observed that by application of Al2O3thin film coating using atomic layer deposition (ALD) to the Si nanodome structures, both optical and electrical performances are greatly improved. The reflectivity of less than 3% over the wavelength range of from 200 nm to 2000 nm at an incident angle from 0° to 45° is achieved when the Al2O3 film is 90 nm thick. The ultimate efficiency of around 27% is obtained on the CND textured 2 μm-thick Si solar cells, which is compared to the efficiency of around 25.75% and 15% for the 2 μm-thick Si nanodome surface-decorated and planar samples respectively. Electrical characterization was made by using CND-decorated MOS devices to measure device's leakage current and capacitance dispersion. It is found the electrical performance is sensitive to the thickness of the Al2O3 film, and the performance is remarkably improved when the dielectric layer thickness is 90 nm thick. The leakage current, which is less than 4x10-9 A/cm2 over voltage range of from -3 V to 3 V, is reduced by several orders of magnitude. C-V measurements also shows as small as 0.3% of variation in the capacitance over the frequency range from 10 kHz to 500 kHz, which is a strong indication of surface states being fully passivated. TEM examination of CND-decorated samples also reveals the occurrence of SiOx layer formed between the interface of Si and the Al2O3 film, which is thin enough that ensures the presence of field-effect passivation, From our theoretical and experimental study, we believe Al2O3 coated CND structures is a truly viable approach to achieving higher device efficiency.

  7. MIM capacitors with various Al2O3 thicknesses for GaAs RFIC application

    NASA Astrophysics Data System (ADS)

    Jiahui, Zhou; Hudong, Chang; Honggang, Liu; Guiming, Liu; Wenjun, Xu; Qi, Li; Simin, Li; Zhiyi, He; Haiou, Li

    2015-05-01

    The impact of various thicknesses of Al2O3 metal—insulator—metal (MIM) capacitors on direct current and radio frequency (RF) characteristics is investigated. For 20 nm Al2O3, the fabricated capacitor exhibits a high capacitance density of 3850 pF/mm2 and acceptable voltage coefficients of capacitance of 681 ppm/V2 at 1 MHz. An outstanding VCC-α of 74 ppm/V2 at 1 MHz, resonance frequency of 8.2 GHz and Q factor of 41 at 2 GHz are obtained by 100 nm Al2O3 MIM capacitors. High-performance MIM capacitors using GaAs process and atomic layer deposition Al2O3 could be very promising candidates for GaAs RFIC applications. Project supported by the National Natural Science Foundation of China (Nos. 61274077, 61474031), the Guangxi Natural Science Foundation (No. 2013GXNSFGA019003), the Guangxi Department of Education Project (No. 201202ZD041), the Guilin City Technology Bureau (Nos. 20120104-8, 20130107-4), the China Postdoctoral Science Foundation Funded Project (Nos. 2012M521127, 2013T60566), the National Basic Research Program of China (Nos. 2011CBA00605, 2010CB327501), the Innovation Project of GUET Graduate Education (Nos. GDYCSZ201448, GDYCSZ201449), the State Key Laboratory of Electronic Thin Films and Integrated Devices, UESTC (No. KFJJ201205), and the Guilin City Science and Technology Development Project (Nos. 20130107-4, 20120104-8).

  8. Crack-resistant Al2O3-SiO2 glasses.

    PubMed

    Rosales-Sosa, Gustavo A; Masuno, Atsunobu; Higo, Yuji; Inoue, Hiroyuki

    2016-01-01

    Obtaining "hard" and "crack-resistant" glasses have always been of great important in glass science and glass technology. However, in most commercial glasses both properties are not compatible. In this work, colorless and transparent xAl2O3-(100-x)SiO2 glasses (30 ≤ x ≤ 60) were fabricated by the aerodynamic levitation technique. The elastic moduli and Vickers hardness monotonically increased with an increase in the atomic packing density as the Al2O3 content increased. Although a higher atomic packing density generally enhances crack formation in conventional oxide glasses, the indentation cracking resistance increased by approximately seven times with an increase in atomic packing density in binary Al2O3-SiO2 glasses. In particular, the composition of 60Al2O3 • 40SiO2 glass, which is identical to that of mullite, has extraordinary high cracking resistance with high elastic moduli and Vickers hardness. The results indicate that there exist aluminosilicate compositions that can produce hard and damage-tolerant glasses. PMID:27053006

  9. New fully bakeable and moveable vacuum seal between stainless steel and Al2O3 ceramic.

    PubMed

    Langenwalter, M; Grössl, M; Märk, T D

    1979-02-01

    The current paper describes a simple construction which allows the monitoring of the radial dependence of the extracted and mass identified ion currents in a hollow cathode stationary afterglow apparatus at any time during the afterglow. The main feature of the monitoring device is a fully bakeable and moveable vacuum seal between polished stainless steel and polished Al2O3 ceramic. PMID:18699481

  10. Crack-resistant Al2O3–SiO2 glasses

    PubMed Central

    Rosales-Sosa, Gustavo A.; Masuno, Atsunobu; Higo, Yuji; Inoue, Hiroyuki

    2016-01-01

    Obtaining “hard” and “crack-resistant” glasses have always been of great important in glass science and glass technology. However, in most commercial glasses both properties are not compatible. In this work, colorless and transparent xAl2O3–(100–x)SiO2 glasses (30 ≤ x ≤ 60) were fabricated by the aerodynamic levitation technique. The elastic moduli and Vickers hardness monotonically increased with an increase in the atomic packing density as the Al2O3 content increased. Although a higher atomic packing density generally enhances crack formation in conventional oxide glasses, the indentation cracking resistance increased by approximately seven times with an increase in atomic packing density in binary Al2O3–SiO2 glasses. In particular, the composition of 60Al2O3•40SiO2 glass, which is identical to that of mullite, has extraordinary high cracking resistance with high elastic moduli and Vickers hardness. The results indicate that there exist aluminosilicate compositions that can produce hard and damage-tolerant glasses. PMID:27053006

  11. Crystallization kinetics of BaO-Al2O3-SiO2 glasses

    NASA Technical Reports Server (NTRS)

    Bansal, Narottam P.; Hyatt, Mark J.

    1988-01-01

    Barium aluminosilicate glasses are being investigated as matrix materials in high-temperature ceramic composites for structural applications. Kinetics of crystallization of two refractory glass compositions in the barium aluminosilicate system were studied by differential thermal analysis (DTA), X-ray diffraction (XRD), and scanning electron microscopy (SEM). From variable heating rate DTA, the crystallization activation energies for glass compositions (wt percent) 10BaO-38Al2O3-51SiO2-1MoO3 (glass A) and 39BaO-25Al2O3-35SiO2-1MoO3 (glass B) were determined to be 553 and 558 kJ/mol, respectively. On thermal treatment, the crystalline phases in glasses A and B were identified as mullite (3Al2O3-2SiO2) and hexacelsian (BaO-Al2O3-2SiO2), respectively. Hexacelsian is a high-temperature polymorph which is metastable below 1590 C. It undergoes structural transformation into the orthorhombic form at approximately 300 C accompanied by a large volume change which is undesirable for structural applications. A process needs to be developed where stable monoclinic celsian, rather than hexacelsian, precipitates out as the crystal phase in glass B.

  12. Nature of MgO and Al2O3 Dissolution in Metallurgical Slags

    NASA Astrophysics Data System (ADS)

    Yan, Pengcheng; Webler, Bryan A.; Pistorius, P. Chris; Fruehan, Richard J.

    2015-12-01

    The nature of MgO and Al2O3 dissolution in metallurgical slags may affect production cost, efficiency, and product quality. However, the rate-limiting dissolution mechanism, chemical reaction or boundary layer diffusion, is not well understood. In the present report, the dissolution mechanism of MgO and Al2O3 in metallurgical slag was evaluated based on available literature data. The mass balance between the dissolving particle and the flux equation through the boundary layer was applied to predict the dissolution curve. The influence of fluid flow was taken into account to calculate the mass transfer rate at the oxide/slag interface. It was found that the rate-limiting step of MgO and Al2O3 dissolution is the same: mass transfer through the boundary layer. Depending on the slag composition and experimental temperature, the effective diffusion coefficient for MgO and Al2O3 dissolution falls in the range of 10-12 to 10-9 m2/s.

  13. Plasma etching behavior of Y2O3 ceramics: Comparative study with Al2O3

    NASA Astrophysics Data System (ADS)

    Cao, Yu-Chao; Zhao, Lei; Luo, Jin; Wang, Ke; Zhang, Bo-Ping; Yokota, Hiroki; Ito, Yoshiyasu; Li, Jing-Feng

    2016-03-01

    The plasma etching behavior of Y2O3 coating was investigated and compared with that of Al2O3 coating under various conditions, including chemical etching, mixing etching and physical etching. The etching rate of Al2O3 coating declined with decreasing CF4 content under mixing etching, while that of Y2O3 coating first increased and then decreased. In addition, the Y2O3 coating demonstrated higher erosion-resistance than Al2O3 coating after exposing to fluorocarbon plasma. X-ray photoelectron spectroscopy (XPS) analysis confirmed the formations of YF3 and AlF3 on the Y2O3 and Al2O3 coatings, respectively, which acted as the protective layer to prevent the surface from further erosion with fluorocarbon plasma. It was revealed that the etching behavior of Y2O3 depended not only on the surface fluorination but also on the removal of fluoride layer. To analyze the effect of porosity, Y2O3 bulk samples with high density were prepared by spark plasma sintering, and they demonstrated higher erosion-resistances compared with Y2O3 coating.

  14. Spin-coatable Al2O3 resists in electron-beam nanolithography

    NASA Astrophysics Data System (ADS)

    Saifullah, Mohammad S.; Namatsu, Hideo; Yamaguchi, Toru; Yamazaki, Kenji; Kurihara, Kenji

    1999-06-01

    Inorganic resist such as amorphous alumina are projected as potential candidates for high resolution electron beam nanolithography; the drawbacks being its low sensitivity and tedious deposition process such as sputtering. Therefore, a spin-coatable Al2O3 resist with higher sensitivity is strongly desirable to overcome these drawbacks. In this paper, we describe the electron beam exposure characteristics of spin-coatable Al2O3 gel films prepared by reacting aluminium tri-sec-butoxide, Al(OBus)3 with chelating agents like ethylacetoacetate. The electron beam sensitivity of approximately 70nm thick Al2O3 gel films baked at 40 degrees C as well as in the no-bake condition is approximately 4mCcm-2, which is approximately 106 times higher than the sputtered alumina films. Baking at 70 degrees C seems to produce little change in the sensitivity. The Fourier transformed IR spectroscopy studies indicate that the increased sensitivity of these films is due to the rapid breakdown of chelate rings under the electron beam. This rapid breakdown of organic bonds could have resulted in the appearance of inorganic Al-O bonds which are insoluble in acetone. Indeed the spin-coatable Al2O3 resist provides high resolution negative line patterns of linewidth of about 20nm.

  15. Acid-base properties of the surface of the α-Al2O3 suspension

    NASA Astrophysics Data System (ADS)

    Ryazanov, M. A.; Dudkin, B. N.

    2009-12-01

    The distribution of the acid-base centers on the surface of α-Al2O3 suspension particles was studied by potentiometric titration, and the corresponding p K spectra were constructed. It was inferred that the double electric layer created by the supporting electrolyte substantially affected the screening of the acid-base centers on the particle surface of the suspension.

  16. MALEIC ANHYDRIDE HYDROGENATION OF PD/AL2O3 CATALYST UNDER SUPERCRITICAL CO2 MEDIUM

    EPA Science Inventory

    Hydrogenation of maleic anhydride (MA) to either y-butyrolactone of succinic anhydride over simple Pd/Al2O3 impregnated catalyst in supercritical CO2 medium has been studied at different temperatures and pressures. A comparison of the supercritical CO2 medium reaction with the c...

  17. Nanopore patterning using Al2O3 hard masks on SOI substrates

    NASA Astrophysics Data System (ADS)

    Wang, Xiaofeng; Goryll, Michael

    2015-07-01

    Aluminum oxide Al2O3, deposited using amorphous atomic layer deposition (ALD), is a very promising material to be utilized as a hard mask for nano-patterning. We used an aluminum oxide hard mask on a silicon-on-insulator (SOI) substrate to implement a sub-100 nm nanopore process. The transfer of nanoscale patterns via dry etching of the Al2O3 thin film was investigated by comparing etch profiles, etch rates, and selectivity of Al2O3 over PMMA resist, using different gas chemistries such as Cl2, Ar, Ar/BCl3 mixtures, and BCl3 plasma. A selectivity of 1:4 was observed using an inductively coupled plasma reactive ion etching (ICP-RIE) tool with BCl3 plasma, and the sub-100 nm nanopore patterns were anisotropically transferred to the alumina layer from a 250 nm PMMA layer. The dense and inert Al2O3 hard mask showed exceptional etch selectivity to Si and SiO2, which allowed the subsequent transfer of the nanopore patterns into the 340 nm-thick Si device layer and made it possible to attempt etching the 1 μm-thick buried oxide (BOX) layer. Using chlorine chemistry, nanopores patterned in the Si device layer showed excellent anisotropy while preserving the original pattern dimensions. The process demonstrated is ideally suited for patterning high aspect ratio nanofluidic structures.

  18. Synthesis of MgO nanoparticle loaded mesoporous Al2O3 and its defluoridation study

    NASA Astrophysics Data System (ADS)

    Dayananda, Desagani; Sarva, Venkateswara R.; Prasad, Sivankutty V.; Arunachalam, Jayaraman; Parameswaran, Padmanabhan; Ghosh, Narendra N.

    2015-02-01

    MgO nanoparticle loaded mesoporous alumina has been synthesized using a simple aqueous solution based cost effective method for removal of fluoride from water. Wide angle powder X-ray diffraction, nitrogen adsorption desorption analysis, transmission electron microscopy techniques and energy dispersive X-ray spectroscopy were used to characterize the synthesized adsorbents. Synthesized adsorbents possess high surface area with mesoporous structure. The adsorbents have been thoroughly investigated for the adsorption of F- using batch adsorption method. MgO nanoparticle loading on mesoporous Al2O3 enhances the F- adsorption capacity of Al2O3 from 56% to 90% (initial F- concentration = 10 mg L-1). Kinetic study revealed that adsorption kinetics follows the pseudo-second order model, suggesting the chemisorption mechanism. The F- adsorption isotherm data was explained by both Langmuir and Freundlich model. The maximum adsorption capacity of 40MgO@Al2O3 was 37.35 mg g-1. It was also observed that, when the solutions having F- concentration of 5 mg L-1 and 10 mg L-1 was treated with 40MgO@Al2O3, the F- concentration in treated water became <1 mg L-1, which is well below the recommendation of WHO.

  19. Crystallization kinetics of BaO-Al2O3-SiO2 glasses

    NASA Technical Reports Server (NTRS)

    Bansal, Narottam P.; Hyatt, Mark J.

    1989-01-01

    Barium aluminosilicate glasses are being investigated as matrix materials in high-temperature ceramic composites for structural applications. Kinetics of crystallization of two refractory glass compositions in the barium aluminosilicate system were studied by differential thermal analysis (DTA), X-ray diffraction (XRD), and scanning electron microscopy (SEM). From variable heating rate DTA, the crystallization activation energies for glass compositions (wt percent) 10BaO-38Al2O3-51SiO2-1MoO3 (glass A) and 39BaO-25Al2O3-35SiO2-1MoO3 (glass B) were determined to be 553 and 558 kJ/mol, respectively. On thermal treatment, the crystalline phases in glasses A and B were identified as mullite (3Al2O3-2SiO2) and hexacelsian (BaO-Al2O3-2SiO2), respectively. Hexacelsian is a high-temperature polymorph which is metastable below 1590 C. It undergoes structural transformation into the orthorhombic form at approximately 300 C accompanied by a large volume change which is undesirable for structural applications. A process needs to be developed where stable monoclinic celsian, rather than hexacelsian, precipitates out as the crystal phase in glass B.

  20. Compatibility of Ce-TZP/Al2O3 nanocomposite frameworks and veneering porcelains.

    PubMed

    Terui, Yuichi; Sato, Kotaro; Goto, Daisuke; Hotta, Yasuhiro; Tamaki, Yukimichi; Miyazaki, Takashi

    2013-01-01

    The aim of this study was to examine the compatibility of Ce-TZP/Al2O3 nanocomposite (CTA) frameworks and veneering porcelains using the Schwickerath crack initiation test and clarify the effects on debonding/crack initiation strength (DIS) of both surface pretreatment (include heat treatment) of the frameworks, type of veneering porcelain varying the coefficient of thermal expansion (CTE), and surface roughness of the frameworks. The surfaces of Ce-TZP/Al2O3 plates were mechanically treated and followed by post-heat treatment. The liner and body porcelains were built up and fired according to the manufacturer's instructions. Surface analyses of the fractured plates showed compatibility with liner porcelains. Since no statistically difference in the DIS was found amongst the different surface treatments, post-heat treatments don't be mandatory. Whereas, since differences in DIS were found when different porcelains with different CTE were used, we concluded the matching of CTE of the porcelain with that of Ce-TZP/Al2O3 was important for successful all-ceramic restorations using Ce-TZP/Al2O3 frameworks. PMID:24088843

  1. Self limiting atomic layer deposition of Al2O3 on perovskite surfaces: a reality?

    NASA Astrophysics Data System (ADS)

    Choudhury, Devika; Rajaraman, Gopalan; Sarkar, Shaibal K.

    2016-03-01

    The feasibility of self-saturated atomic layer deposition of Al2O3 on an organolead halide perovskite (MAPbI3-xClx) surface through a well known trimethylaluminium (TMA)-water (H2O) chemistry is studied. Though the sequential dosages of reactants form films on the perovskite surfaces, a self saturated growth is never observed. Self-saturation leads to the degradation of the material. Both experimental and density functional theory calculations are carried out for complete understanding of the growth mechanism of self-limiting Al2O3 on the perovskite surface.The feasibility of self-saturated atomic layer deposition of Al2O3 on an organolead halide perovskite (MAPbI3-xClx) surface through a well known trimethylaluminium (TMA)-water (H2O) chemistry is studied. Though the sequential dosages of reactants form films on the perovskite surfaces, a self saturated growth is never observed. Self-saturation leads to the degradation of the material. Both experimental and density functional theory calculations are carried out for complete understanding of the growth mechanism of self-limiting Al2O3 on the perovskite surface. Electronic supplementary information (ESI) available: Additional QCM results, FTIR spectra and DFT results. See DOI: 10.1039/c5nr06974b

  2. Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films.

    PubMed

    Mirvakili, Mehr Negar; Van Bui, Hao; van Ommen, J Ruud; Hatzikiriakos, Savvas G; Englezos, Peter

    2016-06-01

    Surface modification of cellulosic paper is demonstrated by employing plasma assisted atomic layer deposition. Al2O3 thin films are deposited on paper substrates, prepared with different fiber sizes, to improve their barrier properties. Thus, a hydrophobic paper is created with low gas permeability by combining the control of fiber size (and structure) with atomic layer deposition of Al2O3 films. Papers are prepared using Kraft softwood pulp and thermomechanical pulp. The cellulosic wood fibers are refined to obtain fibers with smaller length and diameter. Films of Al2O3, 10, 25, and 45 nm in thickness, are deposited on the paper surface. The work demonstrates that coating of papers prepared with long fibers efficiently reduces wettability with slight enhancement in gas permeability, whereas on shorter fibers, it results in significantly lower gas permeability. Wettability studies on Al2O3 deposited paper substrates have shown water wicking and absorption over time only in papers prepared with highly refined fibers. It is also shown that there is a certain fiber size at which the gas permeability assumes its minimum value, and further decrease in fiber size will reverse the effect on gas permeability. PMID:27165172

  3. Optical observation of DNA translocation through Al2O3 sputtered silicon nanopores in porous membrane

    NASA Astrophysics Data System (ADS)

    Yamazaki, Hirohito; Ito, Shintaro; Esashika, Keiko; Taguchi, Yoshihiro; Saiki, Toshiharu

    2016-03-01

    Nanopore sensors are being developed as a platform for analyzing single DNA, RNA, and protein. In nanopore sensors, ionic current measurement is widely used and proof-of-concept of nanopore DNA sequencing by it has been demonstrated by previous studies. Recently, we proposed an alternative platform of nanopore DNA sequencing that incorporates ultraviolet light and porous silicon membrane to perform high-throughput measurement. In the development of our DNA sequencing platform, controlling nanopore size in porous silicon membrane is essential but remains a challenge. Here, we report on observation of DNA translocation through Al2O3 sputtered silicon nanopores (Al2O3 nanopores) by our optical scheme. Electromagnetic wave simulation was performed to analyze the excitation volume on Al2O3 nanopores generated by focused ultraviolet light. In the experiment, DNA translocation time through Al2O3 nanopores was compared with that of silicon nanopores and we examined the effect of nanopore density and thickness of membrane by supplementing the static electric field simulation.

  4. Erbium-ion implantation into various crystallographic cuts of Al2O3

    NASA Astrophysics Data System (ADS)

    Nekvindova, P.; Mackova, A.; Malinsky, P.; Cajzl, J.; Svecova, B.; Oswald, J.; Wilhelm, R. A.

    2015-12-01

    This paper reports on the importance of crystallographic cuts with a different orientation on the luminescent properties and structural changes of Al2O3 implanted with Er+ ions at 190 keV and with a fluence of 1.0 × 1016 cm-2. Post-implantation annealing at 1000 °C in oxygen atmosphere was also done. The chemical compositions and erbium concentration-depth profiles of implanted layers were studied by Rutherford Backscattering Spectrometry (RBS) and compared to SRIM simulations. The same value of the maximum erbium concentration (up to 2 at.%) was observed at a depth of about 40 nm for all crystallographic cuts. The structural properties of the prepared layers were characterised by RBS/channelling. The relative amount of disordered atoms of 70-80% was observed in the prepared implanted layers and discussed for various cuts. It has been found that erbium is positioned randomly in the Al2O3 crystalline matrix, and no preferential positions appeared even after the annealing procedure. Erbium luminescence properties were measured in the wavelength range of 1440-1650 nm for all samples. As-implanted Al2O3 samples had a significant luminescence band at 1530 nm. The best luminescence was repeatedly observed in the <0 0 0 1> cut of Al2O3. The annealing procedure significantly improved the luminescent properties.

  5. Crack-resistant Al2O3–SiO2 glasses

    NASA Astrophysics Data System (ADS)

    Rosales-Sosa, Gustavo A.; Masuno, Atsunobu; Higo, Yuji; Inoue, Hiroyuki

    2016-04-01

    Obtaining “hard” and “crack-resistant” glasses have always been of great important in glass science and glass technology. However, in most commercial glasses both properties are not compatible. In this work, colorless and transparent xAl2O3–(100–x)SiO2 glasses (30 ≤ x ≤ 60) were fabricated by the aerodynamic levitation technique. The elastic moduli and Vickers hardness monotonically increased with an increase in the atomic packing density as the Al2O3 content increased. Although a higher atomic packing density generally enhances crack formation in conventional oxide glasses, the indentation cracking resistance increased by approximately seven times with an increase in atomic packing density in binary Al2O3–SiO2 glasses. In particular, the composition of 60Al2O3•40SiO2 glass, which is identical to that of mullite, has extraordinary high cracking resistance with high elastic moduli and Vickers hardness. The results indicate that there exist aluminosilicate compositions that can produce hard and damage-tolerant glasses.

  6. Precipitation of ZnO in Al 2O 3-doped zinc borate glass ceramics

    NASA Astrophysics Data System (ADS)

    Masai, Hirokazu; Ueno, Takahiro; Takahashi, Yoshihiro; Fujiwara, Takumi

    2011-10-01

    Crystallization behavior of the oxide semiconductor ZnO in zinc borate glass was investigated. The precipitated crystalline phase of glass ceramics containing a small amount of Al 2O 3 was α-Zn 3B 2O 6 whereas that of the glass ceramics containing a large amount of Al 2O 3 was ZnO. It was found that the c-oriented precipitation of ZnO in a glass ceramic was brought about by the in-plane crystal growth of needle-like ZnO crystallites along the a-axis. Amount of Al 2O 3 that can make glass network affected the coordination state of B 2O 3 in the glass, and a three-coordinated BO 3 unit was preferentially formed in the glass containing a higher amount of Al 2O 3. The present results suggest that crystallization of ZnO from multi-component glass is dominated by the local coordination state of the mother glass.

  7. High density Al2O3/TaN-based metal insulator metal capacitors in application to radio frequency integrated circuits

    NASA Astrophysics Data System (ADS)

    Ding, Shi-Jin; Huang, Yu-Jian; Huang, Yue; Pan, Shao-Hui; Zhang, Wei; Wang, Li-Kang

    2007-09-01

    Metal-insulator-metal (MIM) capacitors with atomic-layer-deposited Al2O3 dielectric and reactively sputtered TaN electrodes in application to radio frequency integrated circuits have been characterized electrically. The capacitors exhibit a high density of about 6.05 fF/μm2, a small leakage current of 4.8×10-8 A/cm2 at 3V, a high breakdown electric field of 8.61MV/cm as well as acceptable voltage coefficients of capacitance (VCCs) of 795 ppm/V2 and 268ppm/V at 1 MHz. The observed properties should be attributed to high-quality Al2O3 film and chemically stable TaN electrodes. Further, a logarithmically linear relationship between quadratic VCC and frequency is observed due to the change of relaxation time with carrier mobility in the dielectric. The conduction mechanism in the high field ranges is dominated by the Poole-Frenkel emission, and the leakage current in the low field ranges is likely to be associated with trap-assisted tunnelling. Meanwhile, the Al2O3 dielectric presents charge trapping under low voltage stresses, and defect generation under high voltage stresses, and it has a hard-breakdown performance.

  8. Operando Raman spectroscopy study on the deactivation of Pt/Al2O3 and Pt-Sn/Al2O3 propane dehydrogenation catalysts.

    PubMed

    Sattler, Jesper J H B; Beale, Andrew M; Weckhuysen, Bert M

    2013-08-01

    The deactivation of 0.5 wt% Pt/Al2O3 and 0.5 wt% Pt-1.5 wt% Sn/Al2O3 catalysts has been studied by operando Raman spectroscopy during the dehydrogenation of propane and subsequent regeneration in air for 10 successive dehydrogenation-regeneration cycles. Furthermore, the reaction feed was altered by using different propane/propene/hydrogen ratios. It was found that the addition of hydrogen to the feed increases the catalyst performance and decreases the formation of coke deposits, as was revealed by thermogravimetrical analysis. The positive effect of hydrogen on the catalyst performance is comparable to the addition of Sn, a promoter element which increases both the propane conversion and propene selectivity. Operando Raman spectroscopy showed that hydrogen altered the nature of the coke deposits formed during propane dehydrogenation. Due to this approach it was possible to perform a systematic deconvolution procedure on the Raman spectra. By analysing the related intensity, band position and bandwidth of the different Raman features, it was determined that smaller graphite crystallites, which have less defects, are formed when the partial pressure of hydrogen in the feed was increased. PMID:23615824

  9. Surface Tension of the System NaF -AlF3-Al2O3 and Surface Adsorption of Al2O3

    NASA Astrophysics Data System (ADS)

    Kucharík, Marián; Vasiljev, Roman

    2006-08-01

    Part of the molten system NaF-AlF3-Al2O3 was studied by surface tension measurements, which were performed at cryolite ratios (CR) between 1.5 and 3 [CR = n(NaF)/n(AlF3)]. The maximal bubble pressure method was applied. The surface adsorption of alumina (Al2O3) was also calculated. The obtained results were discussed in terms of the anionic composition of the melt. The addition of AlF3 to melt with CR= 3 decreases the surface tension, as AlF3 is surface-active in molten Na3AlF6. The concentration dependence of the surface tension and the surface adsorption of alumina in the title system are influenced by the formation of surface-active oxofluoroaluminates. An increase of the difference between the surface tension of NaF-AlF3 mixtures and the surface tension of pure alumina was observed with decreasing cryolite ratio.

  10. Defect energetics in α-Al2O3 and rutile TiO2

    NASA Astrophysics Data System (ADS)

    Catlow, C. R. A.; James, R.; Mackrodt, W. C.; Stewart, R. F.

    1982-01-01

    We report a theoretical survey of defect energetics in α-Al2O3 and rutile TiO2 which we relate to structural and transport properties of these materials. The study of these crystals has required us to modify our computational methods based on the Mott-Littleton theory, which were previously confined to the treatment of cubic materials. We discuss the theoretical aspects of a new and quite general computational procedure, HADES III, which can be used for defect calculations on crystals of any symmetry. Our discussion pays particular attention to the effects on the calculated energetics of the use of Mott-Littleton methods adapted for anisotropic crystals. Other features, considered in detail, are the sensitivity of calculated defect energies to the choice of lattice potential and to the size of the atomistically simulated region surrounding the defect. We also compare our results for α-Al2O3 and those of an earlier study of Dienes et al. Our calculations are then used to discuss the simplest features of the defect properties of pure and doped α-Al2O3 and TiO2. The present results support the dominance of Schottky disorder in both crystals; cation Frenkel energies are high and anion Frenkel pairs may be of significance in α-Al2O3. In addition we present a survey of doped alumina and of the effect of oxygen partial pressure on the defect structure of this material. Our results suggest that defect clustering will have a major influence on the properties of doped Al2O3.

  11. Investigating the electronic properties of Al2O3/Cu(In,Ga)Se2 interface

    NASA Astrophysics Data System (ADS)

    Kotipalli, R.; Vermang, B.; Joel, J.; Rajkumar, R.; Edoff, M.; Flandre, D.

    2015-10-01

    Atomic layer deposited (ALD) Al2O3 films on Cu(In,Ga)Se2 (CIGS) surfaces have been demonstrated to exhibit excellent surface passivation properties, which is advantageous in reducing recombination losses at the rear metal contact of CIGS thin-film solar cells. Here, we report, for the first time, experimentally extracted electronic parameters, i.e. fixed charge density (Qf) and interface-trap charge density (Dit), for as-deposited (AD) and post-deposition annealed (PDA) ALD Al2O3 films on CIGS surfaces using capacitance-voltage (C-V) and conductance-frequency (G-f) measurements. These results indicate that the AD films exhibit positive fixed charges Qf (approximately 1012 cm-2), whereas the PDA films exhibit a very high density of negative fixed charges Qf (approximately 1013 cm-2). The extracted Dit values, which reflect the extent of chemical passivation, were found to be in a similar range of order (approximately 1012 cm-2 eV-1) for both AD and PDA samples. The high density of negative Qf in the bulk of the PDA Al2O3 film exerts a strong Coulomb repulsive force on the underlying CIGS minority carriers (ns), preventing them to recombine at the CIGS/Al2O3 interface. Using experimentally extracted Qf and Dit values, SCAPS simulation results showed that the surface concentration of minority carriers (ns) in the PDA films was approximately eight-orders of magnitude lower than in the AD films. The electrical characterization and estimations presented in this letter construct a comprehensive picture of the interfacial physics involved at the Al2O3/CIGS interface.

  12. Structural optical correlated properties of SnO2/Al2O3 core@ shell heterostructure

    NASA Astrophysics Data System (ADS)

    Heiba, Zein K.; Imam, N. G.; Bakr Mohamed, Mohamed

    2016-07-01

    Nano size polycrystalline samples of the core@shell heterostructure of SnO2 @ xAl2O3 (x = 0, 25, 50, 75 wt.%) were synthesized by sol-gel technique. The resulting samples were characterized with fourier transform infrared spectroscopy (FT-IR), photoluminescence (PL) and X-ray powder diffraction (XRD). The XRD patterns manifest diffraction peaks of SnO2 as main phase with weak peaks corresponding to Al2O3 phase. The formation of core@ shell structure is confirmed by TEM images and Rietveld quantitative phase analysis which revealed that small part of Al2O3 is incorporated into the SnO2 lattice while the main part (shell) remains as a separate phase segregated on the grain boundary surface of SnO2 (core). It is found that the grain size of the mixed oxides SnO2 @ xAl2O3 is below 10 nm while for pure SnO2 it is over 41 nm, indicating that alumina can effectively prevent SnO2 from further growing up in the process of calcination. This is confirmed by the large increase in the specific surface area for mixed oxide samples. The PL emission showed great dependence on the structure properties analyzed by XRD and FTIR. The PL results recommend Al2O3@SnO2 core@shell heterostructure to be a promising short-wavelength luminescent optoelectronic devices for blue, UV, and laser light-emitting diodes.

  13. Characteristics of the dynamics of breakdown filaments in Al2O3/InGaAs stacks

    NASA Astrophysics Data System (ADS)

    Palumbo, F.; Shekhter, P.; Cohen Weinfeld, K.; Eizenberg, M.

    2015-09-01

    In this paper, the Al2O3/InGaAs interface was studied by X-ray photoelectron spectroscopy (XPS) after a breakdown (BD) event at positive bias applied to the gate contact. The dynamics of the BD event were studied by comparable XPS measurements with different current compliance levels during the BD event. The overall results show that indium atoms from the substrate move towards the oxide by an electro-migration process and oxidize upon arrival following a power law dependence on the current compliance of the BD event. Such a result reveals the physical feature of the breakdown characteristics of III-V based metal-oxide-semiconductor devices.

  14. Investigation of MOS Interfaces with Atomic-Layer-Deposited High-k Gate Dielectrics on III-V Semiconductors

    NASA Astrophysics Data System (ADS)

    Suri, Rahul

    The purpose of this research work was to investigate the surface passivation methods and metal gate/high-k dielectric gate stacks for metal-oxide-semiconductor devices (MOS) on III-V compound semiconductor materials -- (i) GaAs for future high-speed low-power logic devices and (ii) AlGaN/GaN heterostructure for future high-speed high-power devices. GaAs is a candidate material for high-mobility channel in a NMOS transistor to extend the CMOS scaling up to and beyond the 16-nm technology node. AlGaN/GaN heterostructure is useful in a MOS-high electron mobility transistor (MOS-HEMT) device for providing a high current-carrying two dimensional electron gas (2DEG) channel. The interaction of GaAs surface with atomic layer deposition of high- k dielectrics was investigated to gain fundamental insights into the chemical properties of GaAs surface oxides and high-k/GaAs interface. Electrical characterization of devices was performed to understand the impact of high-k/GaAs interface on MOS device characteristics in order to form a suitable metal/high-k/GaAs gatestack for future high-speed logic and power devices. Reduction of native oxides on GaAs was found to occur during atomic layer deposition (ALD) of high-k dielectrics- HfO2 and Al2O3/HfO 2 nanolaminates on GaAs. Reaction between ALD metal precursor and native oxides on GaAs was identified to be the cause for consumption of native oxides. It was established that the ALD growth temperature has a strong impact on this phenomenon. During post-dielectric annealing the residual arsenic oxides at the interface decomposed leading to an increase in the interfacial gallium oxides. Presence of gallium oxide, Ga2O3 was identified as a cause for observed frequency dispersion in MOS capacitance-voltage curves indicative of a high interface state density. The chemical properties of the AlGaN/GaN heterostructure surface prepared by wet chemical treatment using HCl/HF and NH4OH solutions were investigated and compared. Both HCl and

  15. Effect of Nano-Al2O3 on the Toxicity and Oxidative Stress of Copper towards Scenedesmus obliquus

    PubMed Central

    Li, Xiaomin; Zhou, Suyang; Fan, Wenhong

    2016-01-01

    Nano-Al2O3 has been widely used in various industries; unfortunately, it can be released into the aquatic environment. Although nano-Al2O3 is believed to be of low toxicity, it can interact with other pollutants in water, such as heavy metals. However, the interactions between nano-Al2O3 and heavy metals as well as the effect of nano-Al2O3 on the toxicity of the metals have been rarely investigated. The current study investigated copper toxicity in the presence of nano-Al2O3 towards Scenedesmus obliquus. Superoxide dismutase activity and concentration of glutathione and malondialdehyde in cells were determined in order to quantify oxidative stress in this study. Results showed that the presence of nano-Al2O3 reduced the toxicity of Cu towards S. obliquus. The existence of nano-Al2O3 decreased the growth inhibition of S. obliquus. The accumulation of copper and the level of oxidative stress in algae were reduced in the presence of nano-Al2O3. Furthermore, lower copper accumulation was the main factor that mitigated copper toxicity with the addition of nano-Al2O3. The decreased copper uptake could be attributed to the adsorption of copper onto nanoparticles and the subsequent decrease of available copper in water. PMID:27294942

  16. Influence of Content of Al2O3 on Structure and Properties of Nanocomposite Nb-B-Al-O films.

    PubMed

    Liu, Na; Dong, Lei; Dong, Lei; Yu, Jiangang; Pan, Yupeng; Wan, Rongxin; Gu, Hanqing; Li, Dejun

    2015-12-01

    Nb-B-Al-O nanocomposite films with different power of Al2O3 were successfully deposited on the Si substrate via multi-target magnetron co-sputtering method. The influences of Al2O3's content on structure and properties of obtained nanocomposite films through controlling Al2O3's power were investigated. Increasing the power of Al2O3 can influence the bombarding energy and cause the momentum transfer of NbB2. This can lead to the decreasing content of Al2O3. Furthermore, the whole films showed monocrystalline NbB2's (100) phase, and Al2O3 shaded from amorphous to weak cubic-crystalline when decreasing content of Al2O3. This structure and content changes were proof by X-ray diffraction (XRD) and high-resolution transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). When NbB2 grains were far from each other in lower power of Al2O3, the whole films showed a typical nanocomposite microstructure with crystalline NbB2 grains embedded in a matrix of an amorphous Al2O3 phase. Continuing increasing the power of Al2O3, the less content of Al2O3 tended to cause crystalline of cubic-Al2O3 between the close distances of different crystalline NbB2 grains. The appearance of cubic-crystallization Al2O3 can help to raise the nanocomposite films' mechanical properties to some extent. The maximum hardness and elastic modulus were up to 21.60 and 332.78 GPa, which were higher than the NbB2 and amorphous Al2O3 monolithic films. Furthermore, this structure change made the chemistry bond of O atom change from the existence of O-Nb, O-B, and O-Al bonds to single O-Al bond and increased the specific value of Al and O. It also influenced the hardness in higher temperature, which made the hardness variation of different Al2O3 content reduced. These results revealed that it can enhance the films' oxidation resistance properties and keep the mechanical properties at high temperature. The study highlighted the importance of controlling the Al2O3's content to prepare

  17. Geant4 calculations for space radiation shielding material Al2O3

    NASA Astrophysics Data System (ADS)

    Capali, Veli; Acar Yesil, Tolga; Kaya, Gokhan; Kaplan, Abdullah; Yavuz, Mustafa; Tilki, Tahir

    2015-07-01

    Aluminium Oxide, Al2O3 is the most widely used material in the engineering applications. It is significant aluminium metal, because of its hardness and as a refractory material owing to its high melting point. This material has several engineering applications in diverse fields such as, ballistic armour systems, wear components, electrical and electronic substrates, automotive parts, components for electric industry and aero-engine. As well, it is used as a dosimeter for radiation protection and therapy applications for its optically stimulated luminescence properties. In this study, stopping powers and penetrating distances have been calculated for the alpha, proton, electron and gamma particles in space radiation shielding material Al2O3 for incident energies 1 keV - 1 GeV using GEANT4 calculation code.

  18. Oxygen defects in amorphous Al2O3: A hybrid functional study

    NASA Astrophysics Data System (ADS)

    Guo, Zhendong; Ambrosio, Francesco; Pasquarello, Alfredo

    2016-08-01

    The electronic properties of the oxygen vacancy and interstitial in amorphous Al2O3 are studied via ab initio molecular dynamics simulations and hybrid functional calculations. Our results indicate that these defects do not occur in amorphous Al2O3, due to structural rearrangements which assimilate the defect structure and cause a delocalization of the associated defect levels. The imbalance of oxygen leads to a nonstoichiometric compound in which the oxygen occurs in the form of O2- ions. Intrinsic oxygen defects are found to be unable to trap excess electrons. For low Fermi energies, the formation of peroxy linkages is found to be favored leading to the capture of holes. The relative +2/0 defect levels occur at 2.5 eV from the valence band.

  19. PTOSL response of commercial Al2O3:C detectors to ultraviolet radiation.

    PubMed

    Gronchi, Claudia C; Caldas, Linda V E

    2013-04-01

    The photo-transferred optically stimulated luminescence (PTOSL) technique using Al2O3:C detectors has been suggested as a good option for ultraviolet (UV) radiation dosimetry. The objective of this work was to study the PTOSL response of Al2O3:C InLight detectors and the OSL microStar reader of Landauer. The parameters such as radiation pre-dose, optical treatment time and UV illumination time were determined. The detectors presented a satisfactory stimulus of PTOSL signals when they were subjected to a preconditioning procedure with gamma radiation (1 Gy pre-dose), 30 min of optical treatment (to empty the shallow traps) and 30 min of UV illumination from an artificial source. PMID:22887115

  20. Tribological properties of Ag/Ti films on Al2O3 ceramic substrates

    NASA Technical Reports Server (NTRS)

    Dellacorte, Christopher; Pepper, Stephen V.; Honecy, Frank S.

    1991-01-01

    Ag solid lubricant films, with a thin Ti interlayer for enhanced adhesion, were sputter deposited on Al2O3 substrate disks to reduce friction and wear. The dual Ag/Ti films were tested at room temperature in a pin-on-disk tribometer sliding against bare, uncoated Al2O3 pins under a 4.9 N load at a sliding velocity of 1 m/s. The Ag/Ti films reduced the friction coefficient by 50 percent to about 0.41 compared to unlubricated baseline specimens. Pin wear was reduced by a factor of 140 and disk wear was reduced by a factor of 2.5 compared to the baseline. These films retain their good tribological properties including adhesion after heat treatments at 850 C and thus may be able to lubricate over a wide temperature range. This lubrication technique is applicable to space lubrication, advanced heat engines, and advanced transportation systems.

  1. Effect of sulfur removal on Al2O3 scale adhesion

    NASA Technical Reports Server (NTRS)

    Smialek, James L.

    1991-01-01

    The effect of removing sulfur impurity on the adhesion of Al2O3 scale to NiCrAl was investigated in four experiments. It was found that removing sulfur to concentration less than 1 ppm per weight is sufficient to produce a very significant degree of alpha-Al2O3 scale adhesion to undoped NiCrAl alloys. Results of experiments show that repeated oxidation, and polishing after each oxidation cycle, of pure NiCrAl alloy lowered sulfur content from 10 to 2 ppm by weight (presumably by removing the segregated interfacial layer after each cycle); thinner samples became adherent after fewer oxidation-polishing cycles because of more limited supply of sulfur. It was found that spalling in subsequent cyclic oxidation tests was a direct function of the initial sulfur content. The transition between the adherent and nonadherent behavior was modeled in terms of sulfur flux, sulfur content, and sulfur segregation.

  2. X-ray imaging using the thermoluminescent properties of commercial Al2O3 ceramic plates.

    PubMed

    Shinsho, Kiyomitsu; Kawaji, Yasuyuki; Yanagisawa, Shin; Otsubo, Keisuke; Koba, Yusuke; Wakabayashi, Genichiro; Matsumoto, Kazuki; Ushiba, Hiroaki

    2016-05-01

    This research demonstrated that commercially available alumina is well-suited for use in large area X-ray detectors. We discovered a new radiation imaging device that has a high spatial resolution, high sensitivity, wide dynamic range, large imaging area, repeatable results, and low operating costs. The high thermoluminescent (TL) properties of Al2O3 ceramic plates make them useful for X-ray imaging devices. PMID:26972627

  3. Charge injection from a surface depletion region—The Al 2O 3-silicon system

    NASA Astrophysics Data System (ADS)

    Kolk, J.; Heasell, E. L.

    1980-03-01

    Electron injection from a surface depletion region, over the surface barrier at an Al 2O 3-silicon interface is studied. The current passing over the barrier is measured by observing the rate of flat-band voltage shift as charge is trapped in the oxide. The data obtained is compared with the predictions of present models for charge injection. It is found that the so-called 'lucky-electron' model gives the most generally satisfactory agreement with the observations.

  4. Microstructure and High-Temperature Mechanical Properties of ZrO2-Al2O3-SiC Ceramics

    NASA Astrophysics Data System (ADS)

    Zhang, Xiu-Ping; Ouyang, Jia-Hu; Wang, Yu-Jin; Liu, Zhan-Guo; Wang, Ya-Ming

    2015-09-01

    In the present work, ZrO2-Al2O3 ceramics incorporated with and without β-SiC were prepared by hot pressing. ZrO2-Al2O3 ceramic powder used in this study is a mixture of 71 vol.% YSZ (3 mol.% Y2O3 partially stabilized zirconia) and 29 vol.% α-Al2O3. β-SiC powders with different volume fractions are added into the ZrO2-Al2O3 powder to form the composite powder. The microstructure and high-temperature mechanical properties of ZrO2-Al2O3-SiC ceramics were investigated by tailoring the compositions and sintering parameters to optimize the strengthening mechanisms. For a comparative study, the TZ3Y20A powder was also hot-pressed under identical sintering condition to form dense bulk ceramic. ZrO2-Al2O3-SiC ceramics consist mainly of t-ZrO2, α-Al2O3, and β-SiC phases. SiC particles in the ZrO2-Al2O3 ceramic restrain the grain growth of the oxide matrix. The incorporation of SiC into ZrO2-Al2O3 ceramic enhances high-temperature flexural strength at 1273 K. ZrO2-Al2O3 ceramic incorporated with 15 vol.% SiC has a flexural strength of 518 MPa at 1273 K, much higher than that (201 MPa) of unmodified ZrO2-Al2O3 ceramic.

  5. Insight into the effects of different ageing protocols on Rh/Al2O3 catalyst

    NASA Astrophysics Data System (ADS)

    Zhao, Baohuai; Ran, Rui; Cao, Yidan; Wu, Xiaodong; Weng, Duan; Fan, Jun; Wu, Xueyuan

    2014-07-01

    In this work, a catalyst of Rh loaded on Al2O3 was prepared by impregnating method with rhodium nitrate aqueous solution as the Rh precursor. The catalyst was aged under different protocols (lean, rich, inert and cyclic) to obtain several aged samples. All the Rh/Al2O3 samples were characterized by X-ray diffraction (XRD), Brunauer-Emmett-Teller (BET) method, CO-chemisorption, H2-temperature programmed reduction (H2-TPR), transmission electron microscope (TEM) and X-ray photoelectron spectroscopy (XPS). It was found that a specific ageing treatment could strongly affect the catalytic activity. The N2 aged and the H2 aged samples had a better catalytic activity for CO + NO reaction than the fresh sample while the air aged and the cyclic aged samples exhibited much worse activity. More surface Rh content and better reducibility were obtained in the N2 and the H2 aged samples and the Rh particles existed with an appropriate size, which were all favorable to the catalytic reaction. However, the air and the cyclic ageing protocols induced a strong interaction between Rh species and the Al2O3 support, which resulted in a severe sintering of particles of Rh species and the loss of active sites. The structure evolution scheme of the catalysts aged in different protocols was also established in this paper.

  6. Effect of Hydrogen on Interfacial Structure and Adhesion of Metal/Al_2O_3

    NASA Astrophysics Data System (ADS)

    Wang, Xiao-Gang; Scheffler, Matthias

    2001-03-01

    Metal/sapphire interfaces have been intensively studying because of their importance in many technological applications. A large work of adhesion was found for the oxygen-terminated Al_2O_3(0001)/metal interfaces. As well known, the clean oxygen-terminated Al_2O3 surface is not stable even under a high oxygen pressure[1]. The understanding of how the oxygen-terminated interfaces can be formed is limited. Using an ab initio full-potential linearized augmented plane wave method, we investigated the effect of hydrogen on the formation of metal/Al_2O_3(0001) interfaces. Our results reveal that hydrogen plays an important role in the formation of the oxygen-terminated interfaces. Hydrogen impurities greatly decrease the work of adhesion. The behavior of hydrogen in deposition process of ultrathin metal films on sapphire substrates and the possible structures of the ultrathin films are discussed also. [1] Xiao-Gang Wang, Anne Chaka, Matthias Scheffler, Phys. Rev. Lett. 84, 3650 (2000).

  7. Solid state reduction of chromium (VI) pollution for Al2O3-Cr metal ceramics application

    NASA Astrophysics Data System (ADS)

    Zhu, Hekai; Fang, Minghao; Huang, Zhaohui; Liu, Yangai; Tang, Hao; Min, Xin; Wu, Xiaowen

    2016-04-01

    Reduction of chromium (VI) from Na2CrO4 through aluminothermic reaction and fabrication of metal-ceramic materials from the reduction products have been investigated in this study. Na2CrO4 could be successfully reduced into micrometer-sized Cr particles in a flowing Ar atmosphere in presence of Al powder. The conversion ratio of Na2CrO4 to metallic Cr attained 96.16% efficiency. Al2O3-Cr metal-ceramic with different Cr content (5 wt%, 10 wt%, 15 wt%, 20 wt%) were further prepared from the reduction product Al2O3-Cr composite powder, and aluminum oxide nanopowder via pressure-less sintering. The phase composition, microstructure and mechanical properties of metal-ceramic composites were characterized to ensure the potential of the Al2O3-Cr composite powder to form ceramic materials. The highest relative density and bending strength can reach 93.4% and 205 MP, respectively. The results indicated that aluminothermic reduction of chromium (VI) for metal-ceramics application is a potential approach to remove chromium (VI) pollutant from the environment.

  8. Removal of alachlor from water by catalyzed ozonation on Cu/Al2O3 honeycomb

    PubMed Central

    2013-01-01

    Background The herbicide alachlor (2-chloro-2′6′-diethyl-N-methoxymethylacetanilide) has been known as a probable human carcinogen, and the MCL (minimum contamination level) for drinking water has been set at 2 μg L-1. Therefore, the advanced methods for effectively removing it from water are a matter of interest. Catalyzed ozonation is a promising method for refractory organics degradation. Cu/Al2O3 catalyzed ozonation for degrading an endocrine disruptor (alachlor) in water was investigated. Results Experimental results showed that the ozonation of alachlor can be effectively catalyzed and enhanced by Cu/Al2O3-honeycomb. The main intermediate products formed (aliphatic carboxylic acids) were mineralized to a large extent in the catalytic process. Conclusions This study has shown that Cu/Al2O3-honeycomb is a feasible and efficient catalyst in the ozonation of alachlor in water. Less intermediate oxidation product was produced in the catalytic process than in the uncatalytic one. Furthermore, the mineralization of alachlor could be enhanced by increasing the pH of the reaction solution. PMID:23977841

  9. Impact of Al2O3 on the aggregation and deposition of graphene oxide.

    PubMed

    Ren, Xuemei; Li, Jiaxing; Tan, Xiaoli; Shi, Weiqun; Chen, Changlun; Shao, Dadong; Wen, Tao; Wang, Longfei; Zhao, Guixia; Sheng, Guoping; Wang, Xiangke

    2014-05-20

    To assess the environmental behavior and impact of graphene oxide (GO) on living organisms more accurately, the aggregation of GO and its deposition on Al2O3 particles were systematically investigated using batch experiments across a wide range of solution chemistries. The results indicated that the aggregation of GO and its deposition on Al2O3 depended on the solution pH and the types and concentrations of electrolytes. MgCl2 and CaCl2 destabilized GO because of their effective charge screening and neutralization, and the presence of NaH2PO4 and poly(acrylic acid) (PAA) improved the stability of GO with the increase in pH values as a result of electrostatic interactions and steric repulsion. Specifically, the dissolution of Al2O3 contributed to GO aggregation at relatively low pH or high pH values. Results from this study provide critical information for predicting the fate of GO in aquatic-terrestrial transition zones, where aluminum (hydro)oxides are present. PMID:24754235

  10. Room Temperature Radiolytic Synthesized Cu@CuAlO2-Al2O3 Nanoparticles

    PubMed Central

    Abedini, Alam; Saion, Elias; Larki, Farhad; Zakaria, Azmi; Noroozi, Monir; Soltani, Nayereh

    2012-01-01

    Colloidal Cu@CuAlO2-Al2O3 bimetallic nanoparticles were prepared by a gamma irradiation method in an aqueous system in the presence of polyvinyl pyrrolidone (PVP) and isopropanol respectively as a colloidal stabilizer and scavenger of hydrogen and hydroxyl radicals. The gamma irradiation was carried out in a 60Co gamma source chamber with different doses up to 120 kGy. The formation of Cu@CuAlO2-Al2O3 nanoparticles was observed initially by the change in color of the colloidal samples from colorless to brown. Fourier transform infrared spectroscopy (FTIR) confirmed the presence of bonds between polymer chains and the metal surface at all radiation doses. Results of transmission electron microscopy (TEM), energy dispersive X-ray spectrometry (EDX), and X-ray diffraction (XRD) showed that Cu@CuAlO2-Al2O3 nanoparticles are in a core-shell structure. By controlling the absorbed dose and precursor concentration, nanoclusters with different particle sizes were obtained. The average particle diameter increased with increased precursor concentration and decreased with increased dose. This is due to the competition between nucleation, growth, and aggregation processes in the formation of nanoclusters during irradiation. PMID:23109893

  11. Paramagnetic Spins on -Al2O3 with Varied Surface Termination

    NASA Astrophysics Data System (ADS)

    Ray, Keith; Lee, Donghwa; Adelstein, Nicole; Dubois, Jonathan; Lordi, Vincenzo

    Superconducting qubits (SQs) are promising building blocks for a quantum computer, however, coherence in SQs is reduced by unintended coupling to magnetic noise sources. The microscopic origins of the magnetic noise have not been satisfactorily characterized. Building on previous computational studies of magnetic spins induced by molecules adsorbed on bare Al terminated Al2O3, we present a density functional theory investigation of magnetic noise associated with other Al2O3 surfaces likely to be encountered in experiment. We calculate the exchange interaction between native defects and adsorbed molecules, as well as the magnetic states energy splitting and anisotropy, on fully hydroxylated Al2O3, with and without a water over-layer. We also present simulated x-ray adsorption and x-ray magnetic circular dichroism spectra of these systems with the aim of aiding experimental surface characterization. This work was performed under the auspices of the U.S. Department of Energy by Lawrence Livermore National Laboratory under contract DE-AC52-07NA27344.

  12. Investigation of Al2O3-MWCNTs hybrid dispersion in water and their thermal characterization.

    PubMed

    Nine, M J; Batmunkh, Munkhbayar; Kim, Jun-Hyo; Chung, Han-Shik; Jeong, Hyo-Min

    2012-06-01

    Synthesis of water based Al2O3-MWCNTs hybrid nanofluids have been investigated and characterized. Al2O3-MWCNTs nanoparticles in weight proportion of 97.5:2.5 to 90:10 have been studied over 1% to 6% weight concentration. Dispersion quality of nanofluids is assured by additional synthesis process like acids treatment and grinding of MWCNTs by planetary ball mill. The effects of ground and non-ground MWCNTs over dispersion quality and thermal conductivity have been investigated. Sedimentation effect of hybrid nanofluids with time length has been studied by sample visualization and TEM micrographs. The augmentative absorbance and thermal conductivity of hybrid nanofluids have been compared with pure Al2O3/water nanofluids. The overall result shows that the enhancement in normalized thermal conductivity of hybrid nanofluids is still not so sharp though the absorbance and other qualities show much better comparing mono type nanofluids. Hybrid nanofluids with spherical particles show a smaller increase in thermal conductivity comparing cylindrical shape particles. PMID:22905499

  13. Different behavior of lithium interaction with SiO2 and Al2 O3

    NASA Astrophysics Data System (ADS)

    Zhao, Yufeng; Ban, Chunmei; Kappes, Branden B.; Xu, Qiang; Engtrakul, Chaiwat; Ciobanu, Cristian V.; Dillon, Anne C.

    2014-03-01

    Lithiation of SiO2 and lithium intercalation in Al2O3 is studied both theoretically and experimentally. Lithium interacts with these two types of oxides in distinctly different behaviors. Reversible insertion/extraction of lithium in SiO2 up to a Li density of 2/3 Li per Si are demonstrated experimentally. Density-functional-theory (DFT) calculation shows that neither free interstitial Li atoms (no reduction) nor formation of a local Li2O cluster plus a Si-Si bond (full reduction) is energetically favorable. However, two Li atoms can effectively break a Si-O bond and be stabilized between the Si and O atoms. Such a defect, representing a state of partial reduction of SiO2, is energetically favorable. DFT simulation shows that intercalation of SiO2 at high Li density through partial reduction results in crystalline compounds LixSiO2 (x <2/3) with tunable band-gaps in the range of 2-3.4 eV. In sharp contrast, Al2O3 is very stable against lithiation through any form of reduction. However, good conductivity of Li ions is shown in porous Al2O3. Work funded by the U.S. DOE under Subcontract No. DE-AC36-08GO28308 through the Office of EERE, the Office of the Vehicle Technologies Program, and by NSF through Award Nos. OCI-1048586 and CMMI-0846858.

  14. Effect of adsorbed films on friction of Al2O3-metal systems

    NASA Technical Reports Server (NTRS)

    Pepper, S. V.

    1976-01-01

    The kinetic friction of polycrystalline Al2O3 sliding on Cu, Ni, and Fe in ultrahigh vacuum was studied as a function of the surface chemistry of the metal. Clean metal surfaces were exposed to O2, Cl2, C2H4, and C2H3Cl, and the change in friction due to the adsorbed species was observed. Auger electron spectroscopy assessed the elemental composition of the metal surface. It was found that the systems exposed to Cl2 exhibited low friction, interpreted as the van der Waals force between the Al2O3 and metal chloride. The generation of metal oxide by oxygen exposures resulted in an increase in friction, interpreted as due to strong interfacial bonds established by reaction of metal oxide with Al2O3 to form the complex oxide (spinel). The only effect of C2H4 was to increase the friction of the Fe system, but C2H3Cl exposures decreases friction in both Ni and Fe systems, indicating the dominance of the chlorine over the ethylene complex on the surface

  15. A short-time fading study of Al2O3:C

    NASA Astrophysics Data System (ADS)

    Nascimento, L. F.; Vanhavere, F.; Silva, E. H.; Deene, Y. De

    2015-01-01

    This paper studies the short-time fading from Al2O3:C by measuring optically stimulated luminescence (OSL) signals (Total OSL: TOSL, and Peak OSL: POSL) from droplets and Luxel™ pellets. The influence of various bleaching regimes (blue, green and white) and light power is compared. The fading effect is the decay of the OSL signal in the dark at room temperature. Al2O3:C detectors were submitted to various bleaching regimes, irradiated with a reference dose and read out after different time spans. Investigations were carried out using 2 mm size droplet detectors, made of thin Al2O3:C powder mixed with a photocured polymer. Tests were compared to Luxel™-type detectors (Landauer Inc.). Short-time post-irradiation fading is present in OSL results (TOSL and POSL) droplets for time spans up to 200 s. The effect of short-time fading can be lowered/removed when treating the detectors with high-power and/or long time bleaching regimes; this result was observed in both TOSL and POSL from droplets and Luxel™.

  16. The electrical conductivity of Al2O3 under shock-compression

    PubMed Central

    Liu, Hanyu; Tse, John S.; Nellis, W. J.

    2015-01-01

    Sapphire (Al2O3) crystals are used below 100 GPa as anvils and windows in dynamic-compression experiments because of their transparency and high density. Above 100 GPa shock pressures, sapphire becomes opaque and electrically conducting because of shock-induced defects. Such effects prevent temperature and dc conductivity measurements of materials compressed quasi-isentropically. Opacities and electrical conductivities at ~100 GPa are non-equilibrium, rather than thermodynamic parameters. We have performed electronic structure calculations as a guide in predicting and interpreting shock experiments and possibly to discover a window up to ~200 GPa. Our calculations indicate shocked sapphire does not metallize by band overlap at ~300 GPa, as suggested previously by measured non-equilibrium data. Shock-compressed Al2O3 melts to a metallic liquid at ~500 GPa and 10,000 K and its conductivity increases rapidly to ~2000 Ω−1cm−1 at ~900 GPa. At these high shock temperatures and pressures sapphire is in thermal equilibrium. Calculated conductivity of Al2O3 is similar to those measured for metallic fluid H, N, O, Rb, and Cs. Despite different materials, pressures and temperatures, and compression techniques, both experimental and theoretical, conductivities of all these poor metals reach a common end state typical of strong-scattering disordered materials. PMID:26239369

  17. A nanoplate-like α-Al2O3 out-layered Al2O3-ZrO2 coating fabricated by micro-arc oxidation for hip joint prosthesis

    NASA Astrophysics Data System (ADS)

    Zhang, Lan; Zhang, Wenting; Han, Yong; Tang, Wu

    2016-01-01

    A nanoplate-like α-Al2O3 out-layered Al2O3-ZrO2 coating was fabricated on Zr substrate by micro-arc oxidation (MAO). The structure, formation mechanism, anti-wear property and aging behavior of the coating were explored. The obtained results show that the coating is composed of Al2O3 and ZrO2; the amount and crystallinity of Al2O3 increase gradually from inner layer to the coating surface; monoclinic ZrO2 (m-ZrO2) and tetragonal ZrO2 (t-ZrO2) are both present in the coating, and the ratio of t-ZrO2/m-ZrO2 increases with closing to the coating surface by a "constraint" mechanism of Al2O3; the coating surface mainly consists of nanoplate-like α-Al2O3, and a small amount of nanocrystallized m- and t-ZrO2. The superimposition of α-Al2O3 growth unit on {0 0 0 1} face should be prohibited by PO43- during the MAO process, resulting in the formation of nanoplate-like α-Al2O3 on the coating surface. Compared with pure Zr, the coating shows noticeable improvement in wear-resistance. For aging behavior, although more t-ZrO2 in the coating is transformed to m-ZrO2 with increasing aging time, wear loss increases slightly. It indicates that the nanoplate-like α-Al2O3 out-layered Al2O3-ZrO2 is a potential coating for articular head replacement.

  18. Study on void reduction in direct wafer bonding using Al2O3/HfO2 bonding interface for high-performance Si high-k MOS optical modulators

    NASA Astrophysics Data System (ADS)

    Han, Jae-Hoon; Takenaka, Mitsuru; Takagi, Shinichi

    2016-04-01

    We have investigated the direct wafer bonding (DWB) method with a thin bonding dielectric interface to fabricate Si high-k MOS optical modulators with a thin equivalent oxide thickness (EOT). To suppress void generation on the bonded wafer during high-temperature annealing, we examined the high-k dielectric bonding interfacial layers, such as Al2O3 and HfO2. We found that the Al2O3/HfO2 bilayer enables void-less wafer bonding in conjunction with pre-bonding annealing at 700 °C. By using the 0.5-nm Al2O3/2.0-nm HfO2 bonding interface, the density of voids is reduced by three orders of magnitude as compared with that in the case of using the Al2O3 bonding interface. We achieved a density of voids of approximately 2 × 10-3 cm-2 even when the bonded wafer is annealed at 700 °C. By thermal desorption spectroscopy (TDS), we found that degassing from the bonding interface is successfully suppressed by the introduction of the HfO2 layer and the pre-bonding annealing at 700 °C, which are considered to suppress void generation. Wafer bonding with thin Al2O3/HfO2 high-k bonding interface is promising for Si high-k MOS optical modulators.

  19. Cu/Ba/bauxite: an Inexpensive and Efficient Alternative for Pt/Ba/Al2O3 in NOx Removal

    PubMed Central

    Wang, Xiuyun; Chen, Zhilin; Luo, Yongjin; Jiang, Lilong; Wang, Ruihu

    2013-01-01

    Cu/Ba/bauxite possesses superior NOx storage and reduction (NSR) performances, high thermal stability, strong resistance against SO2 poisoning and outstanding regeneration ability in comparison with Pt/Ba/Al2O3. It can serve as a cheap and promising alternative for traditional Pt/Ba/Al2O3 in NOx removal from lean-burn engines. PMID:23536149

  20. Effect of B content on structure and magnetic properties of FeCoB-Al2O3 nanogranular films

    NASA Astrophysics Data System (ADS)

    Wang, Shu; Zhang, Xudong; Li, Jiangong; Tian, Qiang; Kou, Xinli

    2011-07-01

    The effect of B content on the structure, soft magnetic properties, and high frequency characteristics of as-deposited FeCoB-Al2O3 nanogranular films fabricated by radio frequency magnetron co-sputtering was studied in this work. The introduction of B into the FeCo-Al2O3 films leads to a refinement of granular microstructure. The FeCoB-Al2O3 nanogranular films consist of the FeCoB nanoparticles uniformly embedded in the amorphous Al2O3 matrix. An addition of a small amount of B into the FeCo-Al2O3 films can markedly decrease the coercivity of the films. The excellent magnetic softness with a low coercivity of about 0.08 kA/m was achieved in the FeCoB-Al2O3 films. The Henkel plots confirm the existence of intergranular exchange coupling in the FeCoB-Al2O3 films. The FeCoB-Al2O3 films with low B content exhibit a high permeability over 200 at low frequency and a high-resonance frequency of 3.2 GHz, implying a high cut-off frequency for high frequency applications.

  1. Characterization of Al2O3 in High-Strength Mo Alloy Sheets by High-Resolution Transmission Electron Microscopy.

    PubMed

    Zhou, Yucheng; Gao, Yimin; Wei, Shizhong; Hu, Yajie

    2016-02-01

    A novel type of alumina (Al2O3)-doped molybdenum (Mo) alloy sheet was prepared by a hydrothermal method and a subsequent powder metallurgy process. Then the characterization of α-Al2O3 was investigated using high-resolution transmission electron microscopy as the research focus. The tensile strength of the Al2O3-doped Mo sheet is 43-85% higher than that of the pure Mo sheet, a very obvious reinforcement effect. The sub-micron and nanometer-scale Al2O3 particles can increase the recrystallization temperature by hindering grain boundary migration and improve the tensile strength by effectively blocking the motion of the dislocations. The Al2O3 particles have a good bond with the Mo matrix and there exists an amorphous transition layer at the interface between Al2O3 particles and the Mo matrix in the as-rolled sheet. The sub-structure of α-Al2O3 is characterized by a number of nanograins in the $\\left[ {2\\bar{2}1} \\right]$ direction. Lastly, a new computer-based method for indexing diffraction patterns of the hexagonal system is introduced, with 16 types of diffraction patterns of α-Al2O3 indexed. PMID:26914997

  2. Recombinant Phage Coated 1D Al2O3 Nanostructures for Controlling the Adhesion and Proliferation of Endothelial Cells

    PubMed Central

    Lee, Juseok; Jeon, Hojeong; Haidar, Ayman; Abdul-Khaliq, Hashim; Veith, Michael; Kim, Youngjun

    2015-01-01

    A novel synthesis of a nanostructured cell adhesive surface is investigated for future stent developments. One-dimensional (1D) Al2O3 nanostructures were prepared by chemical vapor deposition of a single source precursor. Afterwards, recombinant filamentous bacteriophages which display a short binding motif with a cell adhesive peptide (RGD) on p3 and p8 proteins were immobilized on these 1D Al2O3 nanostructures by a simple dip-coating process to study the cellular response of human endothelial EA hy.926. While the cell density decreased on as-deposited 1D Al2O3 nanostructures, we observed enhanced cell proliferation and cell-cell interaction on recombinant phage overcoated 1D Al2O3 nanostructures. The recombinant phage overcoating also supports an isotropic cell spreading rather than elongated cell morphology as we observed on as-deposited Al2O3 1D nanostructures. PMID:26090458

  3. Temperature-dependent elastic stiffness constants of α- and θ-Al2O3 from first-principles calculations

    NASA Astrophysics Data System (ADS)

    Shang, Shun-Li; Zhang, Hui; Wang, Yi; Liu, Zi-Kui

    2010-09-01

    Temperature-dependent elastic stiffness constants (cijs), including both the isothermal and isoentropic ones, have been predicted for rhombohedral α-Al2O3 and monoclinic θ-Al2O3 in terms of a quasistatic approach, i.e., a combination of volume-dependent cijs determined by a first-principles strain versus stress method and direction-dependent thermal expansions obtained by first-principles phonon calculations. A good agreement is observed between the predictions and the available experiments for α-Al2O3, especially for the off-diagonal elastic constants. In addition, the temperature-dependent cijs predicted herein, in particular the ones for metastable θ-Al2O3, enable the stress analysis at elevated temperatures in thermally grown oxides containing α- and θ-Al2O3, which are crucial to understand the failure of thermal barrier coatings in gas-turbine engines.

  4. Effect of Microstructure on the Thermal Conductivity of Plasma-Sprayed Al2O3-YSZ Coatings

    NASA Astrophysics Data System (ADS)

    Song, Xuemei; Liu, Ziwei; Kong, Mingguang; Wang, Yongzhe; Huang, Liping; Zheng, Xuebin; Zeng, Yi

    2016-04-01

    The microstructures of three atmospheric plasma-sprayed (APS) Al2O3-ZrO2 coatings were investigated using x-ray diffraction, scanning electron microscopy, and transmission electron microscopy. The differences in the microstructures of the three Al2O3-ZrO2 coatings, including their phase compositions, cracks, pores, grain sizes, and solid solutions, were analyzed in detail. A close relationship was observed between the thermal conductivities of the coatings and the microstructures, and the Al2O3-YSZ coatings with more spherical pores, fewer vertical cracks, and finer grains exhibited the lowest thermal conductivity of 0.91 W/m·K. Compared with YSZ coatings, Al2O3-YSZ coatings can exhibit lower thermal conductivity, which may be attributed to the formation of an amorphous phase, smaller grains, and Al2O3-YSZ solid solution.

  5. Relationship between Eu3+ reduction and glass polymeric structure in Al2O3-modified borate glasses under air atmosphere

    NASA Astrophysics Data System (ADS)

    Jiao, Qing; Yu, Xue; Xu, Xuhui; Zhou, Dacheng; Qiu, Jianbei

    2013-06-01

    The reduction of Eu3+ to Eu2+ is realized efficiently in Eu2O3-doped borate glasses prepared under air condition by melting-quenching method. Luminescent spectra show an increasing tendency of Eu2+ emission with increasing Al2O3 concentration in B2O3-Na2O glasses. It is interesting that significant enhancement appeared of Eu2+ luminescence in the Al2O3-rich sample comparing to the samples of Al2O3 less than 6 mol%. FTIR and Raman scattering measurements indicated that some new vibration modes assigned to the low-polymerized structure groups decomposed from the slight Al2O3 dopant samples. These results demonstrated that the polymerization of the glass structure decreased with increasing incorporation of Al2O3 into the borate glasses, linking to the efficiency of Eu3+ self-reduction in air at high temperature.

  6. Behavior of Al2O3 and SiO2 with heating in a Cl2 + CO stream

    NASA Technical Reports Server (NTRS)

    Shchetinin, L. K.

    1984-01-01

    Differential thermal analysis (DTA) and Thermogravimetric analysis (TGA) were used to study the chlorination of alpha-Al2O3, gamma-Al2O3 and amorphous SiO2 in a Cl + CO stream, for the preparation of AlCl3 and SiCl4. The chlorination starting temperatures were 235 deg for Al2O3 and 680 deg for SiO2. The chlorination of alpha- and gamma-Al2O3 takes place via the formation of AlOCl as an intermediate product, and its subsequent dissociation at 480 to 560 deg, according to 3AlOCl yields AlCl3 + Al2O3. The chlorination activation energies are given for the three oxides.

  7. Thickness-, Composition-, and Magnetic-Field-Dependent Complex Impedance Spectroscopy of Granular-Type-Barrier Co/Co-Al2O3/Co MTJs

    NASA Astrophysics Data System (ADS)

    Tuan, Nguyen Anh; Anh, Nguyen Tuan; Nga, Nguyen Tuyet; Tue, Nguyen Anh; Van Cuong, Giap

    2016-06-01

    The alternating-current (ac) electrical properties of granular-type-barrier magnetic tunnel junctions (GBMTJs) based on Co/Co x (Al2O3)1- x ( t)/Co trilayer structures have been studied using complex impedance spectroscopy (CIS). Their CIS characteristics were investigated in external magnetic fields varying from 0 kOe to 3 kOe as a function of Co composition x at 10 at.%, 25 at.%, and 35 at.%, with barrier layer thickness t of 20 nm to 90 nm. The influence of these factors on the behaviors of the ac impedance response of the GBMTJs was deeply investigated and attributed to the dielectric or conducting nature of the Co-Al2O3 barrier layer. The most remarkable typical phenomena observed in these behaviors, even appearing paradoxical, include lower impedance for thicker t for each given x, a declining trend of Z with increasing x, a clear decrease of Z with H, and especially a partition of Z into zones according to the H value. All these effects are analyzed and discussed to demonstrate that diffusion-type and mass-transfer-type phenomena can be inferred from processes such as spin tunneling and Coulomb or spin blockade in the Co-Al2O3 barrier layer.

  8. Highly Repeatable and Recoverable Phototransistors Based on Multifunctional Channels of Photoactive CdS, Fast Charge Transporting ZnO, and Chemically Durable Al2O3 Layers.

    PubMed

    Ahn, Cheol Hyoun; Kang, Won Jun; Kim, Ye Kyun; Yun, Myeong Gu; Cho, Hyung Koun

    2016-06-22

    Highly repeatable and recoverable phototransistors were explored using a "multifunctional channels" structure with multistacked chalcogenide and oxide semiconductors. These devices were made of (i) photoactive CdS (with a visible band gap), (ii) fast charge transporting ZnO (with a high field-effect mobility), and (iii) a protection layer of Al2O3 (with high chemical durability). The CdS TFT without the Al2O3 protection layer did not show a transfer curve due to the chemical damage that occurred on the ZnO layer during the chemical bath deposition (CBD) process used for CdS deposition. Alternatively, compared to CdS phototransistors with long recovery time and high hysteresis (ΔVth = 19.5 V), our "multi-functional channels" phototransistors showed an extremely low hysteresis loop (ΔVth = 0.5V) and superior photosensitivity with repeatable high photoresponsivity (52.9 A/W at 400 nm). These improvements are likely caused by the physical isolation of the sensing region and charge transport region by the insertion of the ultrathin Al2O3 layer. This approach successfully addresses some of the existing problems in CdS phototransistors, such as the high gate-interface trap site density and high absorption of molecular oxygen, which originate from the polycrystalline CdS. PMID:27259048

  9. The Viscous Behavior of FeOt-Al2O3-SiO2 Copper Smelting Slags

    NASA Astrophysics Data System (ADS)

    Park, Hyun-Shik; Park, Su Sang; Sohn, Il

    2011-08-01

    Understanding the viscous behavior of copper smelting slags is essential in increasing the process efficiency and obtaining the discrete separation between the matte and the slag. The viscosity of the FeOt-SiO2-Al2O3 copper smelting slags was measured in the current study using the rotating spindle method. The viscosity at a fixed Al2O3 concentration decreased with increasing Fe/SiO2 ratio because of the depolymerization of the molten slag by the network-modifying free oxygen ions (O2-) supplied by FeO. The Fourier transform infrared (FTIR) analyses of the slag samples with increasing Fe/SiO2 ratio revealed that the amount of large silicate sheets decreased, whereas the amount of simpler silicate structures increased. Al2O3 additions to the ternary FeOt-SiO2-Al2O3 slag system at a fixed Fe/SiO2 ratio showed a characteristic V-shaped pattern, where initial additions decreased the viscosity, reached a minimum, and increased subsequently with higher Al2O3 content. The effect of Al2O3 was considered to be related to the amphoteric behavior of Al2O3, where Al2O3 initially behaves as a basic oxide and changes to an acidic oxide with variation in slag composition. Furthermore, Al2O3 additions also resulted in the high temperature phase change between fayalite/hercynite and the modification of the liquidus temperature with Al2O3 additions affecting the viscosity of the copper smelting slag.

  10. Nano SnO 2-Al 2O 3 mixed oxide and SnO 2-Al 2O 3-carbon composite oxides as new and novel electrodes for supercapacitor applications

    NASA Astrophysics Data System (ADS)

    Jayalakshmi, M.; Venugopal, N.; Raja, K. Phani; Rao, M. Mohan

    New nano-materials like SnO 2-Al 2O 3 and SnO 2-Al 2O 3-carbon were synthesized by a single step hydrothermal method in searching for novel mixed oxides with high electrochemical double layer capacitance. A SnO 2-Al 2O 3-carbon sample was calcined at 600 °C and tested for its performance. The source of carbon was tetrapropyl ammonium hydroxide. The capacitive behavior of SnO 2 was compared to the performance of SnO 2-Al 2O 3, SnO 2-Al 2O 3-carbon and calcined SnO 2-Al 2O 3-carbon using the techniques of cyclic voltammetry, double potential step, chronopotentiometry and E-log I polarization. In 0.1 M NaCl solutions, SnO 2-Al 2O 3 gave the best performance with a value of 119 Fg -1 and cycled 1000 times. The nano-material mixed oxides were characterized by TEM, XRD, ICP-AES and SEM-EDAX.

  11. High performance GaN-based LEDs on patterned sapphire substrate with patterned composite SiO2/Al2O3 passivation layers and TiO2/Al2O3 DBR backside reflector.

    PubMed

    Guo, Hao; Zhang, Xiong; Chen, Hongjun; Zhang, Peiyuan; Liu, Honggang; Chang, Hudong; Zhao, Wei; Liao, Qinghua; Cui, Yiping

    2013-09-01

    GaN-based light-emitting diodes (LEDs) on patterned sapphire substrate (PSS) with patterned composite SiO(2)/Al(2)O(3) passivation layers and TiO(2)/Al(2)O(3) distributed Bragg reflector (DBR) backside reflector have been proposed and fabricated. Highly passivated Al(2)O(3) layer deposited on indium tin oxide (ITO) layer with excellent uniformity and quality has been achieved with atomic layer deposition (ALD) technology. With a 60 mA current injection, an enhancement of 21.6%, 59.7%, and 63.4% in the light output power (LOP) at 460 nm wavelength was realized for the LED with the patterned composite SiO(2)/Al(2)O(3) passivation layers, the LED with the patterned composite SiO(2)/Al(2)O(3) passivation layers and Ag mirror + 3-pair TiO(2)/SiO(2) DBR backside reflector, and the LED with the patterned composite SiO(2)/Al(2)O(3) passivation layer and Ag mirror + 3-pair ALD-grown TiO(2)/Al(2)O(3) DBR backside reflector as compared with the conventional LED only with a single SiO(2) passivation layer, respectively. PMID:24104020

  12. Effects of MgO/Al2O3 Ratio and Basicity on the Viscosities of CaO-MgO-SiO2-Al2O3 Slags: Experiments and Modeling

    NASA Astrophysics Data System (ADS)

    Pengcheng, Li; Xiaojun, Ning

    2016-02-01

    The effects of the MgO/Al2O3 ratio and basicity on the viscosities of CaO-MgO-SiO2-Al2O3 slags were investigated at 1733 K, 1773 K, and 1823 K (1460 °C, 1500 °C, and 1550 °C) in this study. At a fixed Al2O3 of 15 and 18 mass pct, increasing the basicity from 1 to 1.2 resulted in lowering the viscosity of slags. At a fixed basicity of 1.0 and 1.2, increasing the MgO from 0 to 15 mass pct decreased the viscosity of slags. The Fourier transform-infrared spectra analysis of the slag structure was made to discuss the depolymerization roles of MgO and basicity. Considering the different depolymerization effects of basic oxides upon the silicate/aluminate network structure as suggested by FT-IT analysis, a fresh model for predicting the viscosity of CaO-MgO-SiO2-Al2O3 slags was constructed. A total of 209 viscosity measurements with large compositional variations showed satisfactory agreement with the results calculated by the present model. With the aid of the current model, the co-effects of the MgO/Al2O3 ratio and basicity on the viscosities of CaO-MgO-SiO2-Al2O3 slags (15 to 20 mass pct Al2O3) were investigated.

  13. Tailoring the Valence Band Offset of Al2O3 on Epitaxial GaAs(1-y)Sb(y) with Tunable Antimony Composition.

    PubMed

    Liu, Jheng-Sin; Clavel, Michael; Hudait, Mantu K

    2015-12-30

    Mixed-anion, GaAs1-ySby metamorphic materials with tunable antimony (Sb) compositions extending from 0 to 100%, grown by solid source molecular beam epitaxy (MBE), were used to investigate the evolution of interfacial chemistry under different passivation conditions. X-ray photoelectron spectroscopy (XPS) was used to determine the change in chemical state progression as a function of surface preclean and passivation, as well as the valence band offsets, conduction band offsets, energy band parameters, and bandgap of atomic layer deposited Al2O3 on GaAs1-ySby for the first time, which is further corroborated by X-ray analysis and cross-sectional transmission electron microscopy. Detailed XPS analysis revealed that the near midpoint composition, GaAs0.45Sb0.55, passivation scheme exhibits a GaAs-like surface, and that precleaning by HCl and (NH4)2S passivation are mandatory to remove native oxides from the surface of GaAsSb. The valence band offsets, ΔEv, were determined from the difference in the core level to the valence band maximum binding energy of GaAs1-ySby. A valence band offset of >2 eV for all Sb compositions was found, indicating the potential of utilizing Al2O3 on GaAs1-ySby (0 ≤ y ≤ 1) for p-type metal-oxide-semiconductor (MOS) applications. Moreover, Al2O3 showed conduction band offset of ∼2 eV on GaAs1-ySby (0 ≤ y ≤ 1), suggesting Al2O3 dielectric can also be used for n-type MOS applications. The surface passivation of GaAs0.45Sb0.55 materials and the detailed band alignment analysis of Al2O3 high-κ dielectrics on tunable Sb composition, GaAs1-ySby materials, provides a pathway to utilize GaAsSb materials in future microelectronic and optoelectronic applications. PMID:26642121

  14. High temperature carbon dioxide capture on nano-structured MgO-Al2O3 and CaO-Al2O3 adsorbents: an experimental and theoretical study.

    PubMed

    Bang, Yongju; Han, Seung Ju; Kwon, Soonchul; Hiremath, Vishwanath; Song, In Kyu; Seo, Jeong Gil

    2014-11-01

    Nano-structured alkaline-earth metal oxide adsorbents (denoted as MgO-Al2O3 and CaO-Al2O3) were prepared by an epoxide-driven one-pot sol-gel method, and they were applied to the dynamic and static CO2 adsorption. For comparison, a nano-structured aluminum oxide adsorbent (denoted as Al2O3) was also prepared by a similar method. MgO-Al2O3 adsorbent exhibited a well-developed mesopore structure through the formation of MgAl2O4 spinel phase, whereas CaO-Al2O3 adsorbent was composed of nano-sized CaO and CaAl2O4, resulting in a pore plugging. It was revealed that total basicity increased in the order of Al2O3 (0.11 mmol-CO2/g) < MgO-Al2O3 (0.37 mmol-CO2/g) < CaO-Al2O3, (1.21 mmol-CO2/g), which is in concurrent with adsorption energy obtained from DFT calculations. However, it was found that both basicity and base strength of the adsorbents played an important role in determining the CO2 adsorptive performance at different operating temperature. Among the adsorbents tested, MgO-Al2O3, which mostly retained medium basic sites, exhibited a best CO2 adsorptive performance at 200 degrees C. Furthermore, the experimental results are well supported by theoretical estimation, suggesting a useful design method of adsorbents for facile and regenerative adsorption in the applications of CO2 capture. PMID:25958558

  15. On trapping mechanisms at oxide-traps in Al2O3/GaN metal-oxide-semiconductor capacitors

    NASA Astrophysics Data System (ADS)

    Bisi, D.; Chan, S. H.; Liu, X.; Yeluri, R.; Keller, S.; Meneghini, M.; Meneghesso, G.; Zanoni, E.; Mishra, U. K.

    2016-03-01

    By means of combined current-voltage and capacitance-voltage sweep and transient measurements, we present the effects of forward-bias stress and charge trapping mechanisms at oxide traps in Al2O3/GaN metal-oxide-semiconductor capacitors grown in-situ by metalorganic chemical vapor deposition. Two main current-voltage regimes have been identified: a low-field regime characterized by low gate-current and low flat-band voltage instabilities, and a high-field regime triggered for oxide field greater than 3.3 MV/cm and characterized by the onset of parasitic leakage current and positive flat-band shift. In the low-voltage regime, gate current transients convey stress/relaxation kinetics based on a power-law, suggesting that tunneling trapping mechanisms occur at near-interface traps aligned with the GaN conduction-band minimum. In the high-voltage regime, devices experience parasitic conduction mechanisms and enhanced charge-trapping at oxide-traps revealed by very slow recovery transients.

  16. Mesostructured gamma-Al(2)O(3) with a lathlike framework morphology.

    PubMed

    Zhang, Zhaorong; Pinnavaia, Thomas J

    2002-10-16

    A novel three-step assembly pathway is reported for the formation of a mesostructured alumina with framework pore walls made of crystalline, lathlike gamma-Al(2)O(3) nanoparticles. In the initial supramolecular assembly step of the pathway a mesostructured alumina with a wormhole framework morphology and amorphous pore walls is assembled through the hydrolysis of Al(13) oligocations and hydrated aluminum cations in the presence of a nonionic diblock or triblock poly(ethylene oxide) surfactant as the structure-directing porogen. The walls of the initial mesostructure are then transformed in a second hydrolysis step at a higher temperature to a surfactant-boehmite mesophase, denoted MSU-S/B, with a lathlike framework made of boehmite nanoparticles. A final thermal reaction step topochemically converts the intermediate boehmitic mesophase to a mesostructure with crystalline gamma-Al(2)O(3) pore walls, denoted MSU-gamma, with retention of the lathlike framework morphology. The boehmitic MSU-S/B intermediates formed from the chloride salts of aluminum incorporate chloride anions into the mesostructure. Chloride ion incorporation tends to disorder the nanoparticle assembly process, leading to a broadening of the slit-shaped framework pores in the final MSU-gamma phases and to the introduction of intra- and interparticle textural mesopores. However, the well-ordered MSU-gamma phases made from aluminum nitrate as the preferred aluminum reagent exhibit narrow framework pore size distributions and average pore sizes that are independent of the surfactant size and packing parameter, in accord with a lathlike framework assembled from nanoparticles of regular size and connectivity. The high surface areas ( approximately 300-350 m(2)/g) and pore volumes ( approximately 0.45-0.75 cm(3)/g) provided by these mesostructured forms of gamma-Al(2)O(3) should be useful in materials and catalytic applications where the availability of surface Lewis acid sites and the dispersion of

  17. Self-aligned graphene field-effect transistors on SiC (0001) substrates with self-oxidized gate dielectric

    NASA Astrophysics Data System (ADS)

    Jia, Li; Cui, Yu; Li, Wang; Qingbin, Liu; Zezhao, He; Shujun, Cai; Zhihong, Feng

    2014-07-01

    A scalable self-aligned approach is employed to fabricate monolayer graphene field-effect transistors on semi-insulated 4H-SiC (0001) substrates. The self-aligned process minimized access resistance and parasitic capacitance. Self-oxidized Al2O3, formed by deposition of 2 nm Al followed by exposure in air to be oxidized, is used as gate dielectric and shows excellent insulation. An intrinsic cutoff frequency of 34 GHz and maximum oscillation frequency of 36.4 GHz are realized for the monolayer graphene field-effect transistor with a gate length of 0.2 μm. These studies show a pathway to fabricate graphene transistors for future applications in ultra-high frequency circuits.

  18. Micromechanical stresses in SiC-reinforced Al2O3 composites

    NASA Technical Reports Server (NTRS)

    Li, Zhuang; Bradt, Richard C.

    1989-01-01

    Applying an Eshelby (1957) approach, the internal micromechanical stresses within an SiC-inclusion-reinforced (platelet to whisker geometries) polycrystalline alumina matrix composite were calculated. The results are compared to the experimental residual stress measurements of a SiC-whisker-reinforced Al2O3 by Predecki, et al. (in press) and found to be in excellent agreement. The calculations are then extended to SiC-reinforced composites with polycrystalline mullite, silicon nitride, and cordierite matrices. It is concluded that the internal stresses are significantly influenced by the inclusion geometry as well as the thermoelastic differences between the inclusion and the matrix and also the volume fraction.

  19. Thermal expansion characteristics of Al2O3 nanofluids: More to understand than understood

    NASA Astrophysics Data System (ADS)

    Nayak, A. K.; Singh, R. K.; Kulkarni, P. P.

    2009-03-01

    In this paper, the thermal expansion characteristics of Al2O3 nanofluids have been studied and compared with the base fluid, i.e., water. The nanoparticles used were in the range of 40-80 nm, which were dispersed in water by sonication. Interestingly, it was found that the volumetric rise of the metallic oxide nanofluids is much larger than water for the corresponding temperature rise, which is opposite to what has been interpreted so far. This is one of the wonderful properties of nanofluids that would find tremendous application in many heat extraction systems using natural convection as mode of heat removal.

  20. Hydrogen and Carbon Effects on Al2O3 Surface Phases and Metal Deposition

    NASA Astrophysics Data System (ADS)

    Wang, Xiao-Gang; Smith, John

    2005-03-01

    Effects of H and C impurities on α-Al2O3 (0001) surface stability and metal wetting behavior are determined from first principles[1]. The ab initio surface phase diagram for H and C on the alumina surface reveals six distinct surface phases. These different surface phases exhibit a variety of adhesion strengths with Cu and Co, and correspondingly different wetting behaviors. These results are consistent with the varied wetting characteristics observed experimentally. [1] Xiao-Gang Wang and John R. Smith, Phys. Rev. B70, Rapid communications, 081401 (2004).

  1. Head-up display using an inclined Al2O3 column array.

    PubMed

    Cho, Wen-Hao; Lee, Chao-Te; Kei, Chi-Chung; Liao, Bo-Huei; Chiang, Donyau; Lee, Cheng-Chung

    2014-02-01

    An orderly inclined Al2O3 column array was fabricated by atomic layer deposition and sequential electron beam evaporation using a hollow nanosphere template. The transmittance spectra at various angles of incidence were obtained through the use of a Perkin-Elmer Lambda 900 UV/VIS/NIR spectrometer. The inclined column array could display the image information through a scattering mechanism and was transparent at high viewing angles along the deposition plane. This characteristic of the inclined column array gives it potential for applications in head-up displays in the automotive industry. PMID:24514203

  2. Adherent Al2O3 scales formed on undoped NiCrAl alloys

    NASA Technical Reports Server (NTRS)

    Smialek, James L.

    1987-01-01

    Changes in the spalling behavior of Al2O3 scales formed on an undoped NiCrAl alloy are described. Two samples of Ni-15Cr-13Al (wt pct), one a control and the other sanded, were subjected to 25 oxidation cycles. It is observed that adherent scales formed on the sanded sample; however, the control sample had speckled, spalled scales. The data reveal that the adherent scales are caused by repeated removal of surface layers after each oxidation cycle. It is determined that interfacial segregation of sulfur influences spallation and sulfur removal increases bonding. The effect of moisture on scale adhesions is investigated.

  3. In situ study of atomic layer deposition Al2O3 on GaP (100)

    NASA Astrophysics Data System (ADS)

    Dong, H.; Brennan, B.; Qin, X.; Zhernokletov, D. M.; Hinkle, C. L.; Kim, J.; Wallace, R. M.

    2013-09-01

    The interfacial chemistry of atomic layer deposition (ALD) of Al2O3 on chemically treated GaP (100) has been studied using in situ X-ray photoelectron spectroscopy. A "self-cleaning" effect for Ga-oxide upon exposure to trimethylaluminum is seen to be efficient on the native oxide and chemically treated surfaces. The phosphorus oxide chemical states are seen to change during the ALD process, but the total concentration of P-oxides is seen to remain constant throughout the ALD process.

  4. Photoluminescence and Raman spectroscopy studies of low-temperature γ-Al2O3 phases synthesized from different precursors

    NASA Astrophysics Data System (ADS)

    Baronskiy, Mark; Rastorguev, Alexander; Zhuzhgov, Aleksey; Kostyukov, Anton; Krivoruchko, Oleg; Snytnikov, Valeriy

    2016-03-01

    Spectroscopic features of the local structure of high purity (with the content of impurities <10-3 wt.%) spinel-like γ- and γ∗-Al2O3 phases differing in the unit cell parameters were studied. Samples of these phases were synthesized from crystalline boehmite and nanodispersed pseudoboehmite, respectively. For each of the phases, photoluminescence of transition metal ions and oxygen vacancies - F- and F2-centers - was detected, and Raman scattering spectra were recorded. The photoluminescence study of γ∗-Al2O3 revealed octahedrally coordinated ions Mn4+. Values of the crystal field strength and Racah parameters for Mn4+ ions in γ∗-Al2O3 were determined. Manifestation of PL of Mn4+ ions in γ∗-Al2O3 and its absence in γ-Al2O3 can serve as the indicator for distinguishing between these phases. It was found that γ- and γ∗-Al2O3 samples have individual Raman spectra. The revealed spectroscopic features in the local structure of γ- and γ∗-Al2O3 phases confirm the differences between these spinel-like structures.

  5. Bimetallic Pt-Au Nanocatalysts on ZnO/Al2O3/Monolith for Air Pollution Control.

    PubMed

    Kim, Ki-Joong; Ahn, Ho-Geun

    2015-08-01

    The catalytic activity of a monolithic catalyst with nanosized Pt and Au particles on ZnO/Al2O3 (Pt-Au/ZnO/Al2O3/M) prepared by a wash-coat method was examined, specifically for toluene oxidation. Scanning electron microscopy image showed clearly the formation of a ZnO/Al2O3 layer on the monolith. Nanosized Pt-Au particles on ZnO/Al2O3/M with different sizes could be found in the Pt-Au/ZnO/Al2O3/M catalyst. The conversion of toluene decreased with increasing toluene concentration and was also largely affected by the feed flow rate. The Pt-Au/ZnO/Al2O3/M catalysts prepared in this work have almost the same activity (molecules of toluene per second) compared with a powder Pt-Au/ZnO/Al2O3 catalyst with the same loadings of Pt and Au components; thus this catalyst could be used in controlling air pollution with very low concentrations and high flow rate. PMID:26369207

  6. Bulk and interface trapping in the gate dielectric of GaN based metal-oxide-semiconductor high-electron-mobility transistors

    NASA Astrophysics Data System (ADS)

    Ťapajna, M.; Jurkovič, M.; Válik, L.; Haščík, Š.; Gregušová, D.; Brunner, F.; Cho, E.-M.; Kuzmík, J.

    2013-06-01

    The trapping phenomena in GaN metal-oxide-semiconductor high-electron mobility transistor structures with 10 and 20-nm thick Al2O3 gate dielectric grown by metal-organic chemical vapor deposition were deeply investigated using comprehensive capacitance-voltage measurements. By controlling the interface traps population, substantial electron trapping in the dielectric bulk was identified. Separation between the trapping process and the interface traps emission allowed us to determine distribution of interface trap density in a wide energy range. Temperature dependence of the trapping process indicates thermionic field emission of electrons from the gate into traps with a sheet density of ~1013 cm-2, located a few nm below the gate.

  7. Bulk and interface trapping in the gate dielectric of GaN based metal-oxide-semiconductor high-electron-mobility transistors

    NASA Astrophysics Data System (ADS)

    Ťapajna, M.; Jurkovič, M.; Válik, L.; Haščík, Š.; Gregušová, D.; Brunner, F.; Cho, E.-M.; Kuzmík, J.

    2013-06-01

    The trapping phenomena in GaN metal-oxide-semiconductor high-electron mobility transistor structures with 10 and 20-nm thick Al2O3 gate dielectric grown by metal-organic chemical vapor deposition were deeply investigated using comprehensive capacitance-voltage measurements. By controlling the interface traps population, substantial electron trapping in the dielectric bulk was identified. Separation between the trapping process and the interface traps emission allowed us to determine distribution of interface trap density in a wide energy range. Temperature dependence of the trapping process indicates thermionic field emission of electrons from the gate into traps with a sheet density of ˜1013 cm-2, located a few nm below the gate.

  8. Control of MgO·Al2O3 Spinel Inclusions during Protective Gas Electroslag Remelting of Die Steel

    NASA Astrophysics Data System (ADS)

    Shi, Cheng-Bin; Chen, Xi-Chun; Guo, Han-Jie; Zhu, Zi-Jiang; Sun, Xiao-Lin

    2013-04-01

    The effect of calcium treatment and/or aluminum-based deoxidant addition on the oxygen control and modification of MgO·Al2O3 spinel inclusions during protective gas electroslag remelting (P-ESR) of H13 die steel with low oxygen content was experimentally studied. It is found that all the inclusions in the consumable electrode are MgO·Al2O3 spinels, besides a few MgO·Al2O3 spinels surrounded by an outer (Ti,V)N or MnS layer. After P-ESR refining combined with proper calcium treatment, all the original MgO·Al2O3 spinels in the electrode (except for the original MgO·Al2O3 spinels having been removed in the P-ESR process) were modified to mainly CaO-MgO-Al2O3 and some CaO-Al2O3 inclusions, both of which have a low melting point and homogeneous compositions. In the case of only Al-based deoxidant addition, all the oxide inclusions remaining in ESR ingots are MgO·Al2O3 spinels. The operation of Al-based deoxidant addition and/or calcium treatment during P-ESR of electrode steel containing low oxygen content is invalid to further reduce the oxygen content and oxide inclusions amount compared with remelting only under protective gas atmosphere. All the original sulfide inclusions were removed after the P-ESR process. Most of the inclusions in ESR ingots are about 2 μm in size. The mechanisms of non-metallic inclusions evolution and modification of MgO·Al2O3 spinels by calcium treatment during the P-ESR process were proposed.

  9. Formation mechanism and control of MgO·Al2O3 inclusions in non-oriented silicon steel

    NASA Astrophysics Data System (ADS)

    Sun, Yan-hui; Zeng, Ya-nan; Xu, Rui; Cai, Kai-ke

    2014-11-01

    On the basis of the practical production of non-oriented silicon steel, the formation of MgO·Al2O3 inclusions was analyzed in the process of "basic oxygen furnace (BOF) → RH → compact strip production (CSP)". The thermodynamic and kinetic conditions of the formation of MgO·Al2O3 inclusions were discussed, and the behavior of slag entrapment in molten steel during RH refining was simulated by computational fluid dynamics (CFD) software. The results showed that the MgO/Al2O3 mass ratio was in the range from 0.005 to 0.017 and that MgO·Al2O3 inclusions were not observed before the RH refining process. In contrast, the MgO/Al2O3 mass ratio was in the range from 0.30 to 0.50, and the percentage of MgO·Al2O3 spinel inclusions reached 58.4% of the total inclusions after the RH refining process. The compositions of the slag were similar to those of the inclusions; furthermore, the critical velocity of slag entrapment was calculated to be 0.45 m·s-1 at an argon flow rate of 698 L·min-1, as simulated using CFD software. When the test steel was in equilibrium with the slag, [Mg] was 0.00024wt%-0.00028wt% and [Al]s was 0.31wt%-0.37wt%; these concentrations were theoretically calculated to fall within the MgO·Al2O3 formation zone, thereby leading to the formation of MgO·Al2O3 inclusions in the steel. Thus, the formation of MgO·Al2O3 inclusions would be inhibited by reducing the quantity of slag entrapment, controlling the roughing slag during casting, and controlling the composition of the slag and the MgO content in the ladle refractory.

  10. Effect of thermal annealing on the structure of ZnSe/Al2O3 nanocomposite films

    NASA Astrophysics Data System (ADS)

    Dedyukhin, A. A.; Krylov, P. N.; Kostenkov, N. V.; Zakirova, R. M.; Fedotova, I. V.

    2016-04-01

    The ZnSe/Al2O3 nanocomposite films synthesized by laser evaporation followed by heat treatment are studied. X-ray diffraction and electron-microscopic investigations of the as-deposited films demonstrate the presence of ZnSe crystallites in an Al2O3 amorphous matrix. Annealing changes the structures of ZnSe and Al2O3, increases the ZnSe crystallite size, and causes the appearance of the ZnSeO4 phase. The presence of aluminum oxide layers decreases the phase transformation temperature of zinc selenide.

  11. Containerless solidification of undercooled SrO-Al2O3 binary melts.

    PubMed

    Kato, Katsuyoshi; Masuno, Atsunobu; Inoue, Hiroyuki

    2015-03-01

    The solidification of the SrO-Al2O3 binary system was investigated under containerless conditions using an aerodynamic levitation furnace. Glass formation was observed in compositions with 35-45 mol% SrO and 55-75 mol% SrO. Cooling curves were obtained at a constant cooling rate in the range of 1-1000 °C s(-1). The crystallization temperature was apparently independent of the cooling rate and far below the melting point when the sample was fully crystallized, whereas it decreased when the sample was partially crystallized. The difference between the crystallization temperature and the melting point under containerless conditions is considered a good measure of the glass-forming ability when there is not much difference in the critical cooling rates between the melt compositions. Furthermore, the homogeneous nucleation theory suggests that the apparent time-independent crystallization temperature is attributed to the high glass-forming ability of the SrO-Al2O3 binary system. The results suggest that the experimentally obtained continuous cooling transformation diagrams under containerless conditions provide new insights regarding solidification from an undercooled melt. PMID:25655235

  12. Microstructure-controlled effects on temperature reduction of α-Al 2O 3 crystallite formation

    NASA Astrophysics Data System (ADS)

    Yang, Rung-Je; Yen, Fu-Su; Lin, Shen-Min; Chen, Chih-Cheng

    2007-02-01

    The inter-particle relationship effects on a temperature reduction and simultaneity of α-crystallite formation during θ- to α-phase transformation were examined using DTA, XRD, and TEM techniques. Three powder systems derived from the same θ-powder of average crystallite size 15.2 nm were prepared, with the intention of creating different microstructure for each powder systems as: (1) as-received, (2) pre-treated by homogenization with a mechanical stirring accompanied by pH adjustment for dispersion, and (3) homogenized and additionally uniaxial-pressed to compacts with higher bulk density. Activation energies of θ-crystallite growth occurring in the three powder systems were also obtained based on an isothermal model of grain growth rate equation. It is found that the temperature reduction characteristics can be related to the homogeneity as well as the inter θ-Al 2O 3 crystallite distances behaved by the θ-crystallites. Higher homogeneity and shorter inter-crystallite distance for the θ-powder systems may favor the α-crystallite formation at lower temperatures over a shorter duration of phase transformation. Furthermore, activation energies of θ-crystallite growth can be reduced. And α-Al 2O 3 powders fabricated can be mono-sized and free of vermicular growth.

  13. Revisiting the Al/Al2O3 Interface: Coherent Interfaces and Misfit Accommodation

    PubMed Central

    Pilania, Ghanshyam; Thijsse, Barend J.; Hoagland, Richard G.; Lazić, Ivan; Valone, Steven M.; Liu, Xiang-Yang

    2014-01-01

    We study the coherent and semi-coherent Al/α-Al2O3 interfaces using molecular dynamics simulations with a mixed, metallic-ionic atomistic model. For the coherent interfaces, both Al-terminated and O-terminated nonstoichiometric interfaces have been studied and their relative stability has been established. To understand the misfit accommodation at the semi-coherent interface, a 1-dimensional (1D) misfit dislocation model and a 2-dimensional (2D) dislocation network model have been studied. For the latter case, our analysis reveals an interface dislocation structure with a network of three sets of parallel dislocations, each with pure-edge character, giving rise to a pattern of coherent and stacking-fault-like regions at the interface. Structural relaxation at elevated temperatures leads to a further change of the dislocation pattern, which can be understood in terms of a competition between the stacking fault energy and the dislocation interaction energy at the interface. Our results are expected to serve as an input for the subsequent dislocation dynamics models to understand and predict the macroscopic mechanical behavior of Al/α-Al2O3 composite heterostructures. PMID:24670940

  14. Al2O3 fiber strength degradation in metal and intermetallic matrix composites

    NASA Technical Reports Server (NTRS)

    Draper, S. L.; Locci, I. E.

    1994-01-01

    The mechanisms for fiber damage in single crystal Al2O3 fiber-reinforced composites were investigated. Both fiber fragmentation and fiber strength degradation were observed in composites with a variety of matrix compositions. Four mechanisms that may be contributing to the fiber strength loss have been proposed and include matrix reaction, reaction with binders, residual stress-induced damage, and pressure from hot pressing. The effect of matrix reaction was separated from the other three effects by sputter-coating the matrices on cleaned fibers and annealing with a temperature profile that simulates processing conditions. These experiments revealed that Y and Cr in FeCrAlY base alloys and Zr in NiAl alloys reacted with the fiber, and grooves and adherent particles were formed on the fiber surface which were responsible for the strength loss. The effects of the matrix reaction appeared to dominate over the other possible mechanisms, although evidence for reaction with binders was also found. Ridges on the fiber surface, which reflected the grain boundaries of the matrix, were also observed. In order for single-crystal Al2O3 to be used as a fiber in MMC's and IMC's, a matrix or protective coating which minimizes matrix reaction during processing will be necessary. Of the matrices investigated, the Thermo-span(sup TM) alloy was the least damaging to fiber properties.

  15. Sulfuric acid baking and leaching of spent Co-Mo/Al2O3 catalyst.

    PubMed

    Kim, Hong-In; Park, Kyung-Ho; Mishra, Devabrata

    2009-07-30

    Dissolution of metals from a pre-oxidized refinery plant spent Co-Mo/Al(2)O(3) catalyst have been tried through low temperature (200-450 degrees C) sulfuric acid baking followed by mild leaching process. Direct sulfuric acid leaching of the same sample, resulted poor Al and Mo recoveries, whereas leaching after sulfuric acid baking significantly improved the recoveries of above two metals. The pre-oxidized spent catalyst, obtained from a Korean refinery plant found to contain 40% Al, 9.92% Mo, 2.28% Co, 2.5% C and trace amount of other elements such as Fe, Ni, S and P. XRD results indicated the host matrix to be poorly crystalline gamma- Al(2)O(3). The effect of various baking parameters such as catalyst-to-acid ratio, baking temperature and baking time on percentage dissolutions of metals has been studied. It was observed that, metals dissolution increases with increase in the baking temperature up to 300 degrees C, then decreases with further increase in the baking temperature. Under optimum baking condition more than 90% Co and Mo, and 93% Al could be dissolved from the spent catalyst with the following leaching condition: H(2)SO(4)=2% (v/v), temperature=95 degrees C, time=60 min and Pulp density=5%. PMID:19121897

  16. Enhanced fibroblast cell adhesion on Al/Al2O3 nanowires

    NASA Astrophysics Data System (ADS)

    Aktas, O. C.; Sander, M.; Miró, M. M.; Lee, J.; Akkan, C. K.; Smail, H.; Ott, A.; Veith, M.

    2011-02-01

    Biological cells stick together via transmembrane proteins, which are linked to receptor molecules of the extracellular matrix (ECM). This specific biochemical adhesion plays a leading role in many cellular processes, among them cell differentiation, morphogenesis, and wound healing. Various medical applications require endogen cells to bind to an exogene substrate as in the case of an implant. Coatings with proteins that naturally belong to the ECM are known to enhance the cell adhesion. However, the choice of inorganic materials, which promote cell adhesion, is limited. Here, we report on a new engineered surface composed of Al/Al2O3 bi-phasic nanowires (NWs), which promotes the adhesion of fibroblast cells. Fibroblasts grow well on this inorganic layer and keep proliferating. Using the cell monolayer rheology (CMR) technique, we show that the adhesion of fibroblasts on Al/Al2O3 NWs is comparable to fibronectin coated surfaces. To our knowledge, this is one of the strongest cell adhesions on an inorganic surface, which has been reported on so far, since it compares to bio-organic layers such as fibronectin.

  17. Some TEM observations of Al2O3 scales formed on NiCrAl alloys

    NASA Technical Reports Server (NTRS)

    Smialek, J.; Gibala, R.

    1979-01-01

    The microstructural development of Al2O3 scales on NiCrAl alloys has been examined by transmission electron microscopy. Voids have been observed within grains in scales formed on a pure NiCrAl alloy. Both voids and oxide grains grew measurably with oxidation time at 1100 C. The size and amount of porosity decreased towards the oxide-metal growth interface. It was postulated that the voids resulted from an excess number of oxygen vacancies near the oxide-metal interface. Short-circuit diffusion paths were discussed in reference to current growth stress models for oxide scales. Transient oxidations of pure, Y-doped, and Zr-doped NiCrAl was also examined. Oriented alpha-(Al,Cr)2O3 and Ni(Al,Cr)2O4 scales often coexisted in layered structures on all three alloys. Close-packed oxygen planes and directions in the corundum and spinel layers were parallel. The close relationships between oxide layers provided a gradual transition from initial transient scales to steady state Al2O3 growth.

  18. [Effect of erosion on strength of dental infiltrated Al2O3 ceramics].

    PubMed

    Xiong, Fang; Yu, Haiyang A; Liao, Yunmao; Zhu, Zhimin; Zhou, Zhongrong; Zhu, Minhao

    2005-12-01

    The objective of the research is to investigate the elements of routine sandblast technique on the evolution of bending strength of dental infiltrated Al2O3 ceramics and the underlying erosion mechanism. The plane specimens of an infiltrated ceramic were manufactured, polished and then tested under the modified pen-like sandblasting apparatus (90 degrees erosive angle and 10 mm sandblasting distance), with different grit sizes, working pressure and disposing time. Half of samples were selected randomly and sintered subsequently with Vitadur alpha veneering porcelain. Before and after sintering, the three-point-bending strengths was measured, and the surfaces of dental porcelain were observed with SEM and LCSM. The bending strength of ceramics decreased significantly after sandblast as compared with that of empty control group. After the procedure of sintering the veneering porcelain, the descending evolution of bending strength slowed down. Under the present manufacturing conditions, grit size effect is prominent among those correlative elements of sand grit size, working pressure and disposing time. And fatigue cracking characterizes the mechanism of erosion of dental infiltrated Al2O3 ceramics. PMID:16422096

  19. Tribological performance of Graphene/Carbon nanotube hybrid reinforced Al2O3 composites

    PubMed Central

    Yazdani, Bahareh; Xu, Fang; Ahmad, Iftikhar; Hou, Xianghui; Xia, Yongde; Zhu, Yanqiu

    2015-01-01

    Tribological performance of the hot-pressed pure Al2O3 and its composites containing various hybrid contents of graphene nanoplatelets (GNPs) and carbon nanotubes (CNTs) were investigated under different loading conditions using the ball-on-disc method. Benchmarked against the pure Al2O3, the composite reinforced with a 0.5 wt% GNP exhibited a 23% reduction in the friction coefficient along with a promising 70% wear rate reduction, and a hybrid reinforcement consisting of 0.3 wt.% GNPs + 1 wt.% CNTs resulted in even better performance, with a 86% reduction in the wear rate. The extent of damage to the reinforcement phases caused during wear was studied using Raman spectroscopy. The wear mechanisms for the composites were analysed based on the mechanical properties, brittleness index and microstructural characterizations. The excellent coordination between GNPs and CNTs contributed to the excellent wear resistance property in the hybrid GNT-reinforced composites. GNPs played the important role in the formation of a tribofilm on the worn surface by exfoliation; whereas CNTs contributed to the improvement in fracture toughness and prevented the grains from being pulled out during the tribological test. PMID:26100097

  20. Surface micromorphology of dental composites [CE-TZP]-[Al2O3] with Ca(+2) modifier.

    PubMed

    Berezina, Sofia; Il'icheva, Alla Alexandrovna; Podzorova, Lyudmila Ivanovna; Ţălu, Ştefan

    2015-09-01

    The objective of this study was to characterize the three-dimensional (3D) surface micromorphology of the ceramics produced from nanoparticles of alumina and tetragonal zirconia (t-ZrO2) with addition of Ca(+2) for sintering improvement. The 3D surface roughness of samples was studied by atomic force microscopy (AFM), fractal analysis of the 3D AFM-images, and statistical analysis of surface roughness parameters. Cube counting method, based on the linear interpolation type, applied for AFM data was used for fractal analysis. The morphology of non-modified ceramic sample was characterized by the rather big (1-2 μm) grains of α-Al2O3 phase with a habit close to hexagonal drowned in solid solution of t-ZrO2 with smooth surface. The pattern surfaces of modified composite content a little amount of elongated prismatic grains with composition close to the phase of СаСеAl3О7 as well as hexahedral α-Al2O3-grains. Fractal dimension, D, as well as height values distribution have been determined for the surfaces of the samples with and without modifying. It can be concluded that the smoothest surface is of the modified samples with Ca(+2) modifier but the most regular one is of the non-modified samples. A connection was observed between the surface morphology and the physical properties as assessed in previous works. PMID:26190812

  1. Tribological performance of Graphene/Carbon nanotube hybrid reinforced Al2O3 composites

    NASA Astrophysics Data System (ADS)

    Yazdani, Bahareh; Xu, Fang; Ahmad, Iftikhar; Hou, Xianghui; Xia, Yongde; Zhu, Yanqiu

    2015-06-01

    Tribological performance of the hot-pressed pure Al2O3 and its composites containing various hybrid contents of graphene nanoplatelets (GNPs) and carbon nanotubes (CNTs) were investigated under different loading conditions using the ball-on-disc method. Benchmarked against the pure Al2O3, the composite reinforced with a 0.5 wt% GNP exhibited a 23% reduction in the friction coefficient along with a promising 70% wear rate reduction, and a hybrid reinforcement consisting of 0.3 wt.% GNPs + 1 wt.% CNTs resulted in even better performance, with a 86% reduction in the wear rate. The extent of damage to the reinforcement phases caused during wear was studied using Raman spectroscopy. The wear mechanisms for the composites were analysed based on the mechanical properties, brittleness index and microstructural characterizations. The excellent coordination between GNPs and CNTs contributed to the excellent wear resistance property in the hybrid GNT-reinforced composites. GNPs played the important role in the formation of a tribofilm on the worn surface by exfoliation; whereas CNTs contributed to the improvement in fracture toughness and prevented the grains from being pulled out during the tribological test.

  2. Fabrication of Al2O3-W Functionally Graded Materials by Slipcasting Method

    NASA Astrophysics Data System (ADS)

    Katayama, Tomoyuki; Sukenaga, Sohei; Saito, Noritaka; Kagata, Hajime; Nakashima, Kunihiko

    2011-10-01

    We have successfully fabricated a functionally graded material (FGM) from tungsten and alumina powders by a slip-casting method. This FGM has applications as a sealing and conducting component for high-intensity discharge lamps (HiDLs) that have a translucent alumina envelope. Two types of W powder, with different oxidizing properties, were used as the raw powders for the Al2O3-W FGM. "Oxidized W" was prepared by heat-treatment at 200 °C for 180 min in air. Alumina and each of the W powders were mixed in ultrapure water by ultrasonic stirring. The slurry was then cast into a cylindrical acrylic mold, which had a base of porous alumina, under controlled pressure. The green compacts were subsequently dried, and then sintered using a vacuum furnace at 1600 °C for a fixed time. The microstructures of the FGMs were observed by scanning electron microscopy (SEM) of the polished section. The Al2O3-W FGM with the "oxidized W" powder resulted in a microscopic compositional gradient. However, the FGM with "as-received W" showed no compositional gradient. This result was mainly attributed to the difference between the ζ-potentials of the W powders with the different oxidizing conditions; basically "oxidized W" powder tends to disperse because of the larger ζ-potential of the oxide layer coated on the W powder core.

  3. A light-scattering study of Al2O3 abrasives of various grit sizes

    NASA Astrophysics Data System (ADS)

    Heinson, Yuli W.; Chakrabarti, Amitabha; Sorensen, Christopher M.

    2016-09-01

    We report light scattering phase function measurements for irregularly shaped Al2O3 abrasive powders of various grit sizes. Q-space analysis is applied to the angular scattering to reveal a forward scattering regime, Guinier regime, power law regime with quantifiable exponents, and an enhanced backscattering regime. The exponents of the power laws for Al2O3 abrasives decrease with increasing internal coupling parameter ρ ‧ , which is in agreement with previous observations for other irregular particles. Unlike other dust particles previously studied showing single power laws under Q-space analysis, the largest three abrasives, for which ρ ‧ ≳ 100 , showed a kink in the power law, which is possibly due to the higher degree of symmetry for the abrasives than for all the particles studied previously. Direct comparison of the 1200, 1000, and 800 grit abrasive scattering to scattering by corresponding spheres shows that the scatterings approximately coincide at the spherical particle qR ≃ ρ ‧ crossover point. Furthermore, the scattering at the maximum qR = 2 kR by the irregularly shaped abrasives is close to the geometric centers of the glories of the spheres.

  4. Activation energy of negative fixed charges in thermal ALD Al2O3

    NASA Astrophysics Data System (ADS)

    Kühnhold-Pospischil, S.; Saint-Cast, P.; Richter, A.; Hofmann, M.

    2016-08-01

    A study of the thermally activated negative fixed charges Qtot and the interface trap densities Dit at the interface between Si and thermal atomic-layer-deposited amorphous Al2O3 layers is presented. The thermal activation of Qtot and Dit was conducted at annealing temperatures between 220 °C and 500 °C for durations between 3 s and 38 h. The temperature-induced differences in Qtot and Dit were measured using the characterization method called corona oxide characterization of semiconductors. Their time dependency were fitted using stretched exponential functions, yielding activation energies of EA = (2.2 ± 0.2) eV and EA = (2.3 ± 0.7) eV for Qtot and Dit, respectively. For annealing temperatures from 350 °C to 500 °C, the changes in Qtot and Dit were similar for both p- and n-type doped Si samples. In contrast, at 220 °C the charging process was enhanced for p-type samples. Based on the observations described in this contribution, a charging model leading to Qtot based on an electron hopping process between the silicon and Al2O3 through defects is proposed.

  5. Experimental determination of ampicillin adsorption to nanometer-size Al2O3 in water.

    PubMed

    Peterson, Jonathan W; Burkhart, Rachel S; Shaw, Drew C; Schuiling, Amanda B; Haserodt, Megan J; Seymour, Michael D

    2010-09-01

    Transport of antibiotics in soil-water systems is controlled in part by adsorption to nanometer-size (10(-9)m) particles. Batch adsorption experiments were performed with ampicillin, a common amphoteric antibiotic, and 50 nm-Al(2)O(3) (alpha-alumina) at different pH conditions. Sorption to Al(2)O(3) can be described by linear isotherms for 2.9 microM-2.9 mM ampicillin concentrations. Distribution coefficients (K(d)) are 11.1 (+/-0.32)L kg(-1) at pH 2, 0.55 (+/-.04) L kg(-1) at pH 4, 21.9 (+/-0.9) L kg(-1) at pH 6, and 39.5 (+/-2.2) L kg(-1) at pH 8. At pH 2, approximately 47% of the initially adsorbed drug was removable by rinsing, at pH 4-56% was removed. Only 7% of the drug could be removed by rinsing at pH 6, and 3% at pH 8. Weak electrostatic forces dominate at pH<4, and stronger attachment mechanisms at higher pH. Low yields in rinsing (desorption) experiments at pH6 indicate strong attachment mechanisms, either electrostatic or possibly surface complexation. PMID:20638098

  6. Crystalline gamma-Al2O3 physical vapour deposition-coating for steel thixoforging tools.

    PubMed

    Bobzin, K; Hirt, G; Bagcivan, N; Khizhnyakova, L; Ewering, M

    2011-10-01

    The process of thixoforming, which has been part of many researches during the last decades, combines the advantages of forging and casting for the shaping of metallic components. But due to the high temperatures of semi-solid steel alloys high demands on the tools are requested. To resists the thermal and mechanical loads (wear, friction, thermal and thermomechanical fatigue) protecting thin films are necessary. In this regard crystalline gamma-Al2O3 deposited via Physical Vapour Deposition (PVD) is a promising candidate: It exhibits high thermal stability, high oxidation resistance and high hot hardness. In the present work the application of a (Ti, Al)N/gamma-Al2O3 coating deposited by means of Magnetron Sputter Ion Plating in an industrial coating unit is presented. The coating was analysed by means of Rockwell test, nanoindentation, and Scanning Electron Microscopy (SEM). The coated tool was tested in thixoforging experiments with steel grade X210CrW12 (AlSI D6). The surface of the coated dies was examined with Scanning Electron Microscope (SEM) after 22, 42, 90 and 170 forging cycles. PMID:22400259

  7. Tribological Properties of Ti(Al,O)/Al2O3 Composite Coating by Thermal Spraying

    NASA Astrophysics Data System (ADS)

    Salman, Asma; Gabbitas, Brian; Cao, Peng; Zhang, Deliang

    The use of thermal spray coatings provides protection to the surfaces operating in severe environments. The main goal of the current work is to investigate the possibility of using a high velocity air fuel (HVAF) thermally sprayed wear resistant Ti(Al,O)/Al2O3 coating on tool steel (H13) which is used for making dies for aluminium high pressure die casting and dummy blocks aluminium extrusion. A feedstock of Ti(Al,O)/Al2O3 composite powder was produced from a mixture of Al and TiO2 powders by high energy mechanical milling, followed by a thermal reaction process. The feedstock was then thermally sprayed using a high velocity air-fuel (HVAF) technique onto H13 steel substrates to produce a composite coating. The present study describes and compares the tribological properties such as friction and sliding wear rate of the coating both at room and high temperature (700°C). The wear resistance of the coating was investigated by a tribometer using a spherical ended alumina pin as a counter body under dry and lubricating conditions. The results showed that composite coating has lower wear rate at high temperature than at room temperature without using lubricant. The composite coating was characterized using scanning electron microscopy (SEM), optical microscopy and X-ray diffractometry (XRD). This paper reports the experimental observations and discusses the wear resistance performance of the coatings at room and high temperatures.

  8. Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic

    NASA Astrophysics Data System (ADS)

    Lei, Wenwen; Li, Xingcun; Chen, Qiang; Wang, Zhengduo

    2012-02-01

    Atomic layer deposition (ALD) technique is used in the preparation of organic/inorganic layers, which requires uniform surfaces with their thickness down to several nanometers. For film with such thickness, the growth mode defined as the arrangement of clusters on the surface during the growth is of significance. In this work, Al2O3 thin film was deposited on various interfacial species of pre-treated polyethylene terephthalate (PET, 12 μm) by plasma assisted atomic layer deposition (PA-ALD), where trimethyl aluminium was used as the Al precursor and O2 as the oxygen source. The interfacial species, -NH3, -OH, and -COOH as well as SiCHO (derived from monomer of HMDSO plasma), were grafted previously by plasma and chemical treatments. The growth mode of PA-ALD Al2O3 was then investigated in detail by combining results from in-situ diagnosis of spectroscopic ellipsometry (SE) and ex-situ characterization of as-deposited layers from the morphologies scanned by atomic force microscopy (AFM). In addition, the oxygen transmission rates (OTR) of the original and treated plastic films were measured. The possible reasons for the dependence of the OTR values on the surface species were explored.

  9. Some TEM observations of Al2O3 scales formed on NiCrAl alloys

    NASA Technical Reports Server (NTRS)

    Smialek, J.; Gibala, R.

    1979-01-01

    The microstructural development of Al2O3 scales on NiCrAl alloys has been examined by transmission electron microscopy. Voids were observed within grains in scales formed on a pure NiCrAl alloy. Both voids and oxide grains grew measurably with oxidation time at 1100 C. The size and amount of porosity decreased towards the oxide-metal growth interface. The voids resulted from an excess number of oxygen vacancies near the oxidemetal interface. Short-circuit diffusion paths were discussed in reference to current growth stress models for oxide scales. Transient oxidation of pure, Y-doped, and Zr-doped NiCrAl was also examined. Oriented alpha-(Al, Cr)2O3 and Ni(Al, Cr)2O4 scales often coexisted in layered structures on all three alloys. Close-packed oxygen planes and directions in the corundum and spinel layers were parallel. The close relationship between oxide layers provided a gradual transition from initial transient scales to steady state Al2O3 growth.

  10. Revisiting the Al/Al2O3 Interface: Coherent Interfaces and Misfit Accommodation

    DOE PAGESBeta

    Pilania, Ghanshyam; Thijsse, Barend J.; Hoagland, Richard G.; Lazić, Ivan; Valone, Steven M.; Liu, Xiang-Yang

    2014-03-27

    We report the coherent and semi-coherent Al/α-Al2O3 interfaces using molecular dynamics simulations with a mixed, metallic-ionic atomistic model. For the coherent interfaces, both Al-terminated and O-terminated nonstoichiometric interfaces have been studied and their relative stability has been established. To understand the misfit accommodation at the semi-coherent interface, a 1-dimensional (1D) misfit dislocation model and a 2-dimensional (2D) dislocation network model have been studied. For the latter case, our analysis reveals an interface dislocation structure with a network of three sets of parallel dislocations, each with pure-edge character, giving rise to a pattern of coherent and stacking-fault-like regions at the interface.more » Structural relaxation at elevated temperatures leads to a further change of the dislocation pattern, which can be understood in terms of a competition between the stacking fault energy and the dislocation interaction energy at the interface. In conclusion, our results are expected to serve as an input for the subsequent dislocation dynamics models to understand and predict the macroscopic mechanical behavior of Al/α-Al2O3 composite heterostructures.« less

  11. Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer

    PubMed Central

    Qian, Qingkai; Li, Baikui; Hua, Mengyuan; Zhang, Zhaofu; Lan, Feifei; Xu, Yongkuan; Yan, Ruyue; Chen, Kevin J.

    2016-01-01

    Transistors based on MoS2 and other TMDs have been widely studied. The dangling-bond free surface of MoS2 has made the deposition of high-quality high-k dielectrics on MoS2 a challenge. The resulted transistors often suffer from the threshold voltage instability induced by the high density traps near MoS2/dielectric interface or inside the gate dielectric, which is detrimental for the practical applications of MoS2 metal-oxide-semiconductor field-effect transistor (MOSFET). In this work, by using AlN deposited by plasma enhanced atomic layer deposition (PEALD) as an interfacial layer, top-gate dielectrics as thin as 6 nm for single-layer MoS2 transistors are demonstrated. The AlN interfacial layer not only promotes the conformal deposition of high-quality Al2O3 on the dangling-bond free MoS2, but also greatly enhances the electrical stability of the MoS2 transistors. Very small hysteresis (ΔVth) is observed even at large gate biases and high temperatures. The transistor also exhibits a low level of flicker noise, which clearly originates from the Hooge mobility fluctuation instead of the carrier number fluctuation. The observed superior electrical stability of MoS2 transistor is attributed to the low border trap density of the AlN interfacial layer, as well as the small gate leakage and high dielectric strength of AlN/Al2O3 dielectric stack. PMID:27279454

  12. Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer.

    PubMed

    Qian, Qingkai; Li, Baikui; Hua, Mengyuan; Zhang, Zhaofu; Lan, Feifei; Xu, Yongkuan; Yan, Ruyue; Chen, Kevin J

    2016-01-01

    Transistors based on MoS2 and other TMDs have been widely studied. The dangling-bond free surface of MoS2 has made the deposition of high-quality high-k dielectrics on MoS2 a challenge. The resulted transistors often suffer from the threshold voltage instability induced by the high density traps near MoS2/dielectric interface or inside the gate dielectric, which is detrimental for the practical applications of MoS2 metal-oxide-semiconductor field-effect transistor (MOSFET). In this work, by using AlN deposited by plasma enhanced atomic layer deposition (PEALD) as an interfacial layer, top-gate dielectrics as thin as 6 nm for single-layer MoS2 transistors are demonstrated. The AlN interfacial layer not only promotes the conformal deposition of high-quality Al2O3 on the dangling-bond free MoS2, but also greatly enhances the electrical stability of the MoS2 transistors. Very small hysteresis (ΔVth) is observed even at large gate biases and high temperatures. The transistor also exhibits a low level of flicker noise, which clearly originates from the Hooge mobility fluctuation instead of the carrier number fluctuation. The observed superior electrical stability of MoS2 transistor is attributed to the low border trap density of the AlN interfacial layer, as well as the small gate leakage and high dielectric strength of AlN/Al2O3 dielectric stack. PMID:27279454

  13. Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer

    NASA Astrophysics Data System (ADS)

    Qian, Qingkai; Li, Baikui; Hua, Mengyuan; Zhang, Zhaofu; Lan, Feifei; Xu, Yongkuan; Yan, Ruyue; Chen, Kevin J.

    2016-06-01

    Transistors based on MoS2 and other TMDs have been widely studied. The dangling-bond free surface of MoS2 has made the deposition of high-quality high-k dielectrics on MoS2 a challenge. The resulted transistors often suffer from the threshold voltage instability induced by the high density traps near MoS2/dielectric interface or inside the gate dielectric, which is detrimental for the practical applications of MoS2 metal-oxide-semiconductor field-effect transistor (MOSFET). In this work, by using AlN deposited by plasma enhanced atomic layer deposition (PEALD) as an interfacial layer, top-gate dielectrics as thin as 6 nm for single-layer MoS2 transistors are demonstrated. The AlN interfacial layer not only promotes the conformal deposition of high-quality Al2O3 on the dangling-bond free MoS2, but also greatly enhances the electrical stability of the MoS2 transistors. Very small hysteresis (ΔVth) is observed even at large gate biases and high temperatures. The transistor also exhibits a low level of flicker noise, which clearly originates from the Hooge mobility fluctuation instead of the carrier number fluctuation. The observed superior electrical stability of MoS2 transistor is attributed to the low border trap density of the AlN interfacial layer, as well as the small gate leakage and high dielectric strength of AlN/Al2O3 dielectric stack.

  14. High-performance enhancement-mode AlGaN/GaN MOS-HEMTs with fluorinated stack gate dielectrics and thin barrier layer

    NASA Astrophysics Data System (ADS)

    Tao, Gao; Ruimin, Xu; Kai, Zhang; Yuechan, Kong; Jianjun, Zhou; Cen, Kong; Xinxin, Yu; Xun, Dong; Tangsheng, Chen

    2016-06-01

    We present high-performance enhancement-mode AlGaN/GaN metal—oxide—semiconductor high-electron mobility transistors (MOS-HEMTs) by a fluorinated gate dielectric technique. A nanolaminate of an Al2O3/La x Al1‑x O 3/Al2O3 stack (x≈0.33) grown by atomic layer deposition is employed to avoid fluorine ions implantation into the scaled barrier layer. Fabricated enhancement-mode MOS-HEMTs exhibit an excellent performance as compared to those with the conventional dielectric-last technique, delivering a large maximum drain current of 916 mA/mm and simultaneously a high peak transconductance of 342 mS/mm. The balanced DC characteristics indicate that advanced gate stack dielectrics combined with buffered fluorine ions implantation have a great potential for high speed GaN E/D-mode integrated circuit applications. Project supported by the National Natural Science Foundation of China (Nos. 61504125, 61474101, 61106130 61076120, 61505181), and the Natural Science Foundation of Jiangsu Province of China (Nos. BK20131072, BE2012007, BK2012516).

  15. Interface Modification of Pentacene OFET Gate Dielectrics

    NASA Astrophysics Data System (ADS)

    Jakabovič, Ján; Kováč, Jaroslav; Srnánek, Rudolf; Kováč, Jaroslav; Sokolský, Michal; Cirák, Július; Haško, Daniel; Resel, Roland; Zojer, Egbert

    Pentacene organic field effect transistors (OFETs) electrical and structural properties have already been analysed from the point of view of different gate dielectric and growth conditions utilization. The AFM and micro Raman investigations show that the first organic monolayer at the pentacene/dielectric interface are essential determinants of carrier transport phenomena and achievable drain current of pentacene OFETs.

  16. Effect of Al2O3 on the Viscosity and Structure of CaO-SiO2-MgO-Al2O3-FetO Slags

    NASA Astrophysics Data System (ADS)

    Wang, Zhanjun; Sun, Yongqi; Sridhar, Seetharaman; Zhang, Mei; Guo, Min; Zhang, Zuotai

    2015-04-01

    The present paper provided a fundamental investigation on the effect of Al2O3 on the viscosity and structure of CaO-SiO2-MgO-Al2O3-FetO slags for the purpose of efficiently recycling the valuable elements from the steelmaking slags. The results show that the viscosity of CaO-SiO2-Al2O3-MgO-FetO slags slightly increases with increasing Al2O3 content. The degree of the polymerization (DOP) of quenched slags, determined from Raman spectra and magic angle spinning-nuclear magnetic resonance, is also found to increase with increasing Al2O3 content. It can be deduced that the increasing DOP can promote the formation of gehlenite phase (Ca2Al2SiO7), thus facilitating the formation of higher phosphorous (or vanadium) contained solid solution ( n'Ca2SiO4·Ca3((P or V)O4)2). As Al2O3 content increases up to a specific value, the charge compensating ions which present near [AlO4]-tetrahedra and [FeO4]-tetrahedra are not fully supplied due to the scarcity of Ca2+. In this case, the existing Fe3+ in the melt cannot completely form [FeO4]-tetrahedra and part of Fe3+ would form [FeO6]-octahedra to substitute Ca2+ to modify the slags.

  17. Synthesis of CoFe/Al2O3 composite nanoparticles as the impedance matching layer of wideband multilayer absorber

    NASA Astrophysics Data System (ADS)

    Zhen, L.; Gong, Y. X.; Jiang, J. T.; Xu, C. Y.; Shao, W. Z.; Liu, P.; Tang, J.

    2011-04-01

    CoFe/Al2O3 composite nanoparticles were successfully prepared by hydrogen-thermally reducing cobalt aluminum ferrite. Compared with CoFe alloy nanoparticles, the permeability of CoFe/Al2O3 composite nanoparticles was remarkably enhanced and an improved impedance characteristic was achieved due to the introduction of insulated Al2O3. A multilayer absorber with CoFe/Al2O3 composite nanoparticles as the impedance matching layer and CoFe nanoflake as the dissipation layer was designed by using genetic algorithm, in which an ultrawide operation frequency bandwidth over 2.5-18 GHz was obtained. The microwave absorption performance in both normal and oblique incident case was evaluated by using electromagnetic simulator. The backward radar cross-section (RCS) was decreased at least 10 dB over a wide frequency range by covering the multilayer absorber on the surface of perfect electrical conductive plate.

  18. The role of copper species on Cu/γ-Al2O3 catalysts for NH3-SCO reaction

    NASA Astrophysics Data System (ADS)

    Liang, Chunxia; Li, Xinyong; Qu, Zhenping; Tade, Moses; Liu, Shaomin

    2012-02-01

    UV-vis spectra, XRD, H2-TPR, TEM and ESR were used to characterize a series of Cu/γ-Al2O3 catalysts, which were prepared by incipient wetness impregnation using copper nitrate, copper acetate or copper sulfate as precursors, to study the role of Cu species on Cu/γ-Al2O3 catalysts for NH3-SCO reaction. It was found that the mixture of CuO phase and CuAl2O4 phase formed on various Cu/γ-Al2O3 catalysts, and the Cu species and dispersion had significant influence on the Cu/γ-Al2O3 activity. Highly dispersed CuO phase on the support would be related with its high activity for the NH3-SCO reaction.

  19. Novel fine-disperse bimetallic Pt-Pd/Al2O3 catalysts for glycerol oxidation with molecular oxygen

    NASA Astrophysics Data System (ADS)

    Dubencovs, K.; Chornaja, S.; Sproge, E.; Kampars, V.; Markova, D.; Kulikova, L.; Serga, V.; Cvetkovs, A.

    2013-12-01

    Using extractive-pyrolytic method several Pt-Pd bimetallic catalysts supported on plasma-processed alumina nanopowder were synthesized. Pt-Pd loading and glycerol oxidation process parameter influence on catalyst activity and selectivity was determined oxidizing glycerol in mild conditions. Novel bimetallic catalysts in neutral water solutions were practically inactive (glycerol conversion was only 3%) whereas in alkaline solutions they were active and selective to glyceric acid. Using 1.2%Pt-1.2%Pd/Al2O3 catalyst glyceric acid was obtained with 65% selectivity (glycerol conversion was 96%). It was shown that novel fine-disperse bimetallic Pt-Pd/Al2O3 catalysts were more active compared to analogous monometallic Pt/Al2O3 and Pd/Al2O3 catalysts.

  20. Radiolysis of aqueous 4-nitrophenol solution with Al2O3 or TiO2 nanoparticles.

    PubMed

    Follut, F; Vel Leitner, N Karpel

    2007-02-01

    Aqueous 4-nitrophenol solutions containing TiO2 or Al2O3 nanoparticles were irradiated with electron beam. 4-Nitrophenol was decomposed by the ionizing radiation process in the absence of the nanoparticles. The addition of TiO2 or Al2O3 (2 g l(-1)) before irradiation improved the removal of 4-nitrophenol, total organic carbon (TOC) but also nitrogen (TN). To identify the origin of the loss (catalysis or simply adsorption), TiO2 or Al2O3 nanoparticles were added after irradiation. Experiments show that the effect of the presence of TiO2 or Al2O3 during irradiation is just due to adsorption. PMID:17113129

  1. Effect of the addition of Al2O3 nanoparticles on the magnetic properties of Fe soft magnetic composites

    NASA Astrophysics Data System (ADS)

    Peng, Yuandong; Nie, Junwu; Zhang, Wenjun; Ma, Jian; Bao, Chongxi; Cao, Yang

    2016-02-01

    We investigated the effect of the addition of Al2O3 nanoparticles on the permeability and core loss of Fe soft magnetic composites coated with silicone. Fourier transform infra-red spectroscopy, scanning electron microscopy and energy-dispersive X-ray spectroscopy analysis revealed that the surface layer of the powder particles consisted of a thin insulating Al2O3 layer with uniform surface coverage. The permeability and core loss of the composite with the Al2O3 addition annealed at 650 °C were excellent. The results indicated that the Al2O3 nanoparticle addition increases the permeability stablility with changing frequency and decreases the core loss over a wide range of frequencies.

  2. On the Structural and Chemical Characteristics of Co/Al2O3/graphene Interfaces for Graphene Spintronic Devices

    NASA Astrophysics Data System (ADS)

    Canto, Bárbara; Gouvea, Cristol P.; Archanjo, Bráulio S.; Schmidt, João E.; Baptista, Daniel L.

    2015-09-01

    We report a detailed investigation of the structural and chemical characteristics of thin evaporated Al2O3 tunnel barriers of variable thickness grown onto single-layer graphene sheets. Advanced electron microscopy and spectrum-imaging techniques were used to investigate the Co/Al2O3/graphene/SiO2 interfaces. Direct observation of pinhole contacts was achieved using FIB cross-sectional lamellas. Spatially resolved EDX spectrum profiles confirmed the presence of direct point contacts between the Co layer and the graphene. The high surface diffusion properties of graphene led to cluster-like Al2O3 film growth, limiting the minimal possible thickness for complete barrier coverage onto graphene surfaces using standard Al evaporation methods. The results indicate a minimum thickness of nominally 3 nm Al2O3, resulting in a 0.6 nm rms rough film with a maximum thickness reaching 5 nm.

  3. High temperature oxidation of ZrO2/Al2O3 thin films deposited on steel.

    PubMed

    Lee, Jae Chun; Kim, Sun Kyu; Van Trung, Trinh; Lee, Dong Bok

    2013-11-01

    Thin ZrO2/Al2O3 films that consisted of alternating monoclinic ZrO2 nanolayers and amorphous Al2O3 nanolayers were deposited on a tool steel substrate using Zr and Al cathodes in a cathodic arc plasma deposition system, and then oxidized at 600-900 degrees C in air for up to 50 h. The ZrO2/Al2O3 films effectively suppressed the oxidation of the substrate up to 800 degrees C by acting as a barrier layer against the outward diffusion of the substrate elements and inward diffusion of oxygen. However, rapid oxidation occurred at 900 degrees C due mainly to the increased diffusion and subsequent oxidation of steel as well as the crystallization of amorphous Al2O3. PMID:24245292

  4. Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions

    NASA Astrophysics Data System (ADS)

    Kamimura, Takafumi; Sasaki, Kohei; Hoi Wong, Man; Krishnamurthy, Daivasigamani; Kuramata, Akito; Masui, Takekazu; Yamakoshi, Shigenobu; Higashiwaki, Masataka

    2014-05-01

    The band alignment of Al2O3/n-Ga2O3 was investigated by x-ray photoelectron spectroscopy (XPS). With a band gap of 6.8 ± 0.2 eV measured for Al2O3, the conduction and valence band offsets at the interface were estimated to be 1.5 ± 0.2 eV and 0.7 ± 0.2 eV, respectively. The conduction band offset was also obtained from tunneling current in Al2O3/n-Ga2O3 (2¯01) metal-oxide-semiconductor (MOS) diodes using the Fowler-Nordheim model. The electrically extracted value was in good agreement with the XPS data. Furthermore, the MOS diodes exhibited small capacitance-voltage hysteresis loops, indicating the successful engineering of a high-quality Al2O3/Ga2O3 interface.

  5. Silicon passivation and tunneling contact formation by atomic layer deposited Al2O3/ZnO stacks

    NASA Astrophysics Data System (ADS)

    Garcia-Alonso, D.; Smit, S.; Bordihn, S.; Kessels, W. M. M.

    2013-08-01

    The passivation of Si by Al2O3/ZnO stacks, which can serve as passivated tunneling contacts or heterojunctions in silicon photovoltaics, was investigated. It was demonstrated that stacks with Al2O3 thicknesses >3 nm lead to lower surface recombination velocities (Seff,max < 4 cm s-1) on n- and p-type Si than single-layer Al2O3 films for a wide range of ZnO thicknesses and irrespective of Al-doping of the ZnO. Stacks with an Al2O3 thickness of 1-2 nm were found to combine reasonable surface passivation (Seff,max = 100-700 cm s-1) with sufficiently high tunneling current densities (10-300 mA cm-2 at 700 mV).

  6. On the Structural and Chemical Characteristics of Co/Al2O3/graphene Interfaces for Graphene Spintronic Devices

    PubMed Central

    Canto, Bárbara; Gouvea, Cristol P.; Archanjo, Bráulio S.; Schmidt, João E.; Baptista, Daniel L.

    2015-01-01

    We report a detailed investigation of the structural and chemical characteristics of thin evaporated Al2O3 tunnel barriers of variable thickness grown onto single-layer graphene sheets. Advanced electron microscopy and spectrum-imaging techniques were used to investigate the Co/Al2O3/graphene/SiO2 interfaces. Direct observation of pinhole contacts was achieved using FIB cross-sectional lamellas. Spatially resolved EDX spectrum profiles confirmed the presence of direct point contacts between the Co layer and the graphene. The high surface diffusion properties of graphene led to cluster-like Al2O3 film growth, limiting the minimal possible thickness for complete barrier coverage onto graphene surfaces using standard Al evaporation methods. The results indicate a minimum thickness of nominally 3 nm Al2O3, resulting in a 0.6 nm rms rough film with a maximum thickness reaching 5 nm. PMID:26395513

  7. On the Structural and Chemical Characteristics of Co/Al2O3/graphene Interfaces for Graphene Spintronic Devices.

    PubMed

    Canto, Bárbara; Gouvea, Cristol P; Archanjo, Bráulio S; Schmidt, João E; Baptista, Daniel L

    2015-01-01

    We report a detailed investigation of the structural and chemical characteristics of thin evaporated Al2O3 tunnel barriers of variable thickness grown onto single-layer graphene sheets. Advanced electron microscopy and spectrum-imaging techniques were used to investigate the Co/Al2O3/graphene/SiO2 interfaces. Direct observation of pinhole contacts was achieved using FIB cross-sectional lamellas. Spatially resolved EDX spectrum profiles confirmed the presence of direct point contacts between the Co layer and the graphene. The high surface diffusion properties of graphene led to cluster-like Al2O3 film growth, limiting the minimal possible thickness for complete barrier coverage onto graphene surfaces using standard Al evaporation methods. The results indicate a minimum thickness of nominally 3 nm Al2O3, resulting in a 0.6 nm rms rough film with a maximum thickness reaching 5 nm. PMID:26395513

  8. New half-film method for measuring Al2O3 film MTF of 3rd generation image intensifier

    NASA Astrophysics Data System (ADS)

    Cheng, Yaojin; Shi, Feng; Bai, Xiaofeng; Zhu, Yufeng; Yan, Lei; Liu, Feng; Li, Min

    2012-10-01

    In 3rd generation image intensifier, Al2O3 film on the input of MCP is a serious influence factor on device MTF due to its electron scattering process. There are no reportes about how to measure the MTF of Al2O3 film. In this paper a new Half-film comparssion test method is creatively established for determing the film MTF, which overcomes the difficulty of measuring super thin film less than a few nm. In this way, the MTF curves of 10nm Al2O3 film can be accurately obtained. The measurement results show that 10nm Al2O3 film obviously decay the MTF performance of the 3rd generation image intensifier and take an important role in the improvement work of 3rd generation image intensifier MTF and resolution performances.

  9. Epitaxial growth and electrochemical transfer of graphene on Ir(111)/α-Al2O3(0001) substrates

    NASA Astrophysics Data System (ADS)

    Koh, Shinji; Saito, Yuta; Kodama, Hideyuki; Sawabe, Atsuhito

    2016-07-01

    Low-pressure chemical vapor deposition growth of graphene on Iridium (Ir) layers epitaxially deposited on α-Al2O3 (0001) substrates was investigated. The X-ray diffraction, Raman and reflection high energy electron diffraction characterizations revealed that graphene films were epitaxially grown on Ir(111) layers, and the in-plane epitaxial relationship between graphene, Ir(111), and α-Al2O3(0001) was graphene ⟨ 1 1 ¯ 00 ⟩//Ir⟨ 11 2 ¯ ⟩//α-Al2O3⟨ 11 2 ¯ 0 ⟩. The graphene on Ir(111) was electrochemically transferred onto SiO2/Si substrates. We also demonstrated the reuse of the Ir(111)/α-Al2O3(0001) substrates in multiple growth and transfer cycles.

  10. Thermal expansion and elastic anisotropy in single crystal Al2O3 and SiC reinforcements

    NASA Technical Reports Server (NTRS)

    Salem, Jonathan A.; Li, Zhuang; Bradt, Richard C.

    1994-01-01

    In single crystal form, SiC and Al2O3 are attractive reinforcing components for high temperature composites. In this study, the axial coefficients of thermal expansion and single crystal elastic constants of SiC and Al2O3 were used to determine their coefficients of thermal expansion and Young's moduli as a function of crystallographic orientation and temperature. SiC and Al2O3 exhibit a strong variation of Young's modulus with orientation; however, their moduli and anisotropies are weak functions of temperature below 1000 C. The coefficients of thermal expansion exhibit significant temperature dependence, and that of the non-cubic Al2O3 is also a function of crystallographic orientation.

  11. Effects of macro- and micro-hole milling parameters on Al2O3 ceramics using an ultraviolet laser system

    NASA Astrophysics Data System (ADS)

    Hsiao, W. T.; Tseng, S. F.; Chung, C. K.; Huang, K. C.; Chen, M. F.

    2013-06-01

    Ceramics are commonly used as substrates in electrically insulated integrated circuit, printed circuit board, and lightemitting diode industries because of their excellent dielectric and thermal properties. However, brittle materials (e.q., ceramic alumina, sapphire, glass, and silicon wafer) are difficult to fabricate using wheel tools. Laser material processes are preferred over traditional methods because they allow noncontact processing, avoid tool wear problems, and achieve high speed, high accuracy, and high resolution. Laser material processes also exhibit minimal residual thermal effects and residual stress. This study investigated the laser drilling of Al2O3 ceramic material (with a thickness of 380 μm and hole diameters of 200, 300, and 500 μm, respectively) by using a laser milling method. The macro- and micro-hole milling performance depended on various parameters including the galvanometric scan speed and milling time. A 3D confocal laser scanning microscope and a field-emission scanning electron microscope were used to measure the surface morphology, taper angle, and melted residual height of the machined surface after laser milling. The edge quality and roundness of laser milling were also observed using image-processing edge-detection technology.

  12. Improvement of the GaSb/Al2O3 interface using a thin InAs surface layer

    NASA Astrophysics Data System (ADS)

    Greene, Andrew; Madisetti, Shailesh; Nagaiah, Padmaja; Yakimov, Michael; Tokranov, Vadim; Moore, Richard; Oktyabrsky, Serge

    2012-12-01

    The highly reactive GaSb surface was passivated with a thin InAs layer to limit interface trap state density (Dit) at the III-V/high-k oxide interface. This InAs surface was subjected to various cleaning processes to effectively reduce native oxides before atomic layer deposition (ALD). Ammonium sulfide pre-cleaning and trimethylaluminum/water ALD were used in conjunction to provide a clean interface and annealing in forming gas (FG) at 350 °C resulted in an optimized fabrication for n-GaSb/InAs/high-k gate stacks. Interface trap density, Dit ≈ 2-3 × 1012 cm-2eV-1 resided near the n-GaSb conductance band which was extracted and compared with three different methods. Conductance-voltage-frequency plots showed efficient Fermi level movement and a sub-threshold slope of 200 mV/dec. A composite high-k oxide process was also developed using ALD of Al2O3 and HfO2 resulting in a Dit ≈ 6-7 × 1012 cm-2eV-1. Subjecting these samples to a higher (450 °C) processing temperature results in increased oxidation and a thermally unstable interface. p-GaSb displayed very fast minority carrier generation/recombination likely due to a high density of bulk traps in GaSb.

  13. On the Control of the Fixed Charge Densities in Al2O3-Based Silicon Surface Passivation Schemes.

    PubMed

    Simon, Daniel K; Jordan, Paul M; Mikolajick, Thomas; Dirnstorfer, Ingo

    2015-12-30

    A controlled field-effect passivation by a well-defined density of fixed charges is crucial for modern solar cell surface passivation schemes. Al2O3 nanolayers grown by atomic layer deposition contain negative fixed charges. Electrical measurements on slant-etched layers reveal that these charges are located within a 1 nm distance to the interface with the Si substrate. When inserting additional interface layers, the fixed charge density can be continuously adjusted from 3.5 × 10(12) cm(-2) (negative polarity) to 0.0 and up to 4.0 × 10(12) cm(-2) (positive polarity). A HfO2 interface layer of one or more monolayers reduces the negative fixed charges in Al2O3 to zero. The role of HfO2 is described as an inert spacer controlling the distance between Al2O3 and the Si substrate. It is suggested that this spacer alters the nonstoichiometric initial Al2O3 growth regime, which is responsible for the charge formation. On the basis of this charge-free HfO2/Al2O3 stack, negative or positive fixed charges can be formed by introducing additional thin Al2O3 or SiO2 layers between the Si substrate and this HfO2/Al2O3 capping layer. All stacks provide very good passivation of the silicon surface. The measured effective carrier lifetimes are between 1 and 30 ms. This charge control in Al2O3 nanolayers allows the construction of zero-fixed-charge passivation layers as well as layers with tailored fixed charge densities for future solar cell concepts and other field-effect based devices. PMID:26618751

  14. Al2O3 e-Beam Evaporated onto Silicon (100)/SiO2, by XPS

    SciTech Connect

    Madaan, Nitesh; Kanyal, Supriya S.; Jensen, David S.; Vail, Michael A.; Dadson, Andrew; Engelhard, Mark H.; Samha, Hussein; Linford, Matthew R.

    2013-09-25

    We report the XPS characterization of a thin film of Al2O3 (35 nm) deposited via e-beam evaporation onto silicon (100). The film was characterized with monochromatic Al Ka radiation. An XPS survey scan, an Al 2p narrow scan, and the valence band spectrum were collected. The Al2O3 thin film is used as a diffusion barrier layer for templated carbon nanotube (CNT) growth in the preparation of microfabricated thin layer chromatography plates.

  15. Effect of Al2O3 on the friction performance of P/M composite materials for friction applications

    NASA Astrophysics Data System (ADS)

    Ivǎnuş, R. C.; ǎnuş, D., IV; Cǎlmuc, F.

    2010-06-01

    Bronze bearings are one of most used friction materials. In those applications where higher mechanical properties are needed, iron base bearings can be an alternative to bronze base materials, or other alloying elements added to bronze. The paper presents the results obtained in metal matrix composites field with friction characteristics, for automotive brakes, by P/M. The scope of these researches was the improvement of wear resistance and friction properties of metal matrix composites. Friction-wear properties of the Al2O3 reinforced samples were measured and compared with those of plain bronze based ones. For this purpose, density, hardness, friction coefficient wear behaviour of the samples were tested.Microstructures of samples before and after sintering and worn surfaces were also investigated by scanning electron microscopy (SEM), and the wear types were determined. The optimum friction-wear behaviour was obtained in the sample compacted at 500 MPa and sintered at 820°C. Density of the final samples decreased with increasing the amount of reinforcing elements (Al2O3) before presintering. However after sintering, there is no change in density of the samples including reinforcing elements (Al2O3). With increasing friction surface temperature, a reduction in the friction coefficient of the samples was observed. However, the highest reductions in the friction coefficients were observed in the as-received samples containing 0,5% reinforced Al2O3. The SEM images of the sample indicated that while bronze-based break lining material without Al2O3 showed abrasive wear behaviour, increasing the amount of Al2O3 resulted in a change of abrasive to adhesive wear mechanism. With increasing the amount of reinforcing Al2O3, wear resistance of the samples was increased. However samples reinforced with 5% and 6% Al2O3 showed the best results.

  16. Broadband photoluminescence in the (CaO-Al2O3-SiO2):Eu system

    NASA Astrophysics Data System (ADS)

    Gurin, N. T.; Paksyutov, K. V.; Terent'ev, M. A.; Shirokov, A. V.

    2009-08-01

    Phosphors of the (CaO-Al2O3-SiO2):Eu system obtained by direct solid-state synthesis in air at 1300°C produce broadband photoluminescence (PL) covering the entire visible range under excitation by a nitrogen laser. Upon vacuum annealing, the PL intensity in (CaO-Al2O3-SiO2):Eu and (CaO-Al2O3-2SiO2):Eu samples exhibits a several-fold increase and the latter phosphor yields blue emission according to the CIE color standard. The annealing of a (CaO-Al2O3):Eu composition leads to a change in the emission color from red (close to that according to the EBU scale) to blue (in the same scale). Vacuum-annealed (CaO-2Al2O3):Eu phosphor yields red emission (close to that according to the NTSC scale), while (2CaO-Al2O3):Eu composition exhibits intense purple luminescence.

  17. Mechanical properties of porous Al2O3 composite with surface modified multi-walled carbon nanotubes (MWCNTs).

    PubMed

    Kim, Eun-Hee; Lee, Woo-Ram; Jung, Yeon-Gil

    2011-08-01

    Multi-walled carbon nanotubes (MWCNTs) have been reinforced in alumina (Al2O3) matrix to overcome the inherent brittleness of the Al2O3 matrix. In this work, MWCNTs were treated by acid to provide hydrophilicity to hydrophobic MWCNTs, inducing the homogeneous dispersion of MWCNTs in an aqueous solution. Aluminum hydroxide (Al(OH)3) as a Al2O3 precursor was added in the solution with the modified MWCNTs, and then this mixture solution was filtered at room temperature. The prepared powders were calcinated at 800-1000 degrees C to reduce the gas pocket in the matrix by decomposition of Al(OH)3. Then the calcinated powders were formed, and heat-treated. The porous MWCNTs-Al2O3 composites show higher mechanical properties in flexure strength and hardness than the porous Al2O3 without the reinforcement phase, which is attributed to the high mechanical properties of MWCNTs. However, higher MWCNTs contents in the composites decrease the mechanical properties due to the aggregation of MWCNTs in the composites. Therefore, control of the MWCNTs content and its dispersibility in the matrix are key factors to be considered for the fabrication of the porous MWCNT-Al2O3 composites. PMID:22103230

  18. Size-dependent sorption of myo-inositol hexakisphosphate and orthophosphate on nano-γ-Al2O3.

    PubMed

    Yan, Yupeng; Koopal, Luuk K; Li, Wei; Zheng, Anmin; Yang, Jun; Liu, Fan; Feng, Xionghan

    2015-08-01

    The effects of particle size (5, 35 and 70nm) on the sorption of myo-inositol hexakisphosphate (IHP) and inorganic phosphate (KH2PO4, Pi) on γ-Al2O3 nanoparticles were investigated using batch sorption experiments, zeta potential measurements and solid-state nuclear magnetic resonance spectroscopy (NMR). The results show that the maximum sorption densities (μmolm(-2)) for IHP and Pi increase with decreasing γ-Al2O3 particle size. The sorption affinity of γ-Al2O3 for IHP and Pi generally increases with decreasing particle size, and the sorption affinity for IHP is approximately one order of magnitude greater than that for Pi. In our experimental time scale, surface complexation is the main mechanism for IHP and Pi sorption on large size γ-Al2O3. While an additional surface precipitation mechanism, indicated by solid-state (31)P and (27)Al NMR data, is partly responsible for the greater sorption density on very small size γ-Al2O3. Compared with Pi, the effect of particle size on the sorption of IHP is more pronounced. The results suggest a size-dependent surface reactivity of Al2O3 nanoparticles with Pi/IHP. The underlying mechanism will also be relevant for other small nanosize (hydr)oxide particles and is important for our understanding of the role of small nanoparticles in controlling the mobility and fate of organic and inorganic phosphates in the environment. PMID:25890116

  19. Postperovskite phase equilibria in the MgSiO3–Al2O3 system

    PubMed Central

    Tsuchiya, Jun; Tsuchiya, Taku

    2008-01-01

    We investigate high-P,T phase equilibria of the MgSiO3–Al2O3 system by means of the density functional ab initio computation methods with multiconfiguration sampling. Being different from earlier studies based on the static substitution properties with no consideration of Rh2O3(II) phase, present calculations demonstrate that (i) dissolving Al2O3 tends to decrease the postperovskite transition pressure of MgSiO3 but the effect is not significant (≈-0.2 GPa/mol% Al2O3); (ii) Al2O3 produces the narrow perovskite+postperovskite coexisting P,T area (≈1 GPa) for the pyrolitic concentration (xAl2O3 ≈6 mol%), which is sufficiently responsible to the deep-mantle D″ seismic discontinuity; (iii) the transition would be smeared (≈4 GPa) for the basaltic Al-rich composition (xAl2O3 ≈20 mol%), which is still seismically visible unless iron has significant effects; and last (iv) the perovskite structure spontaneously changes to the Rh2O3(II) with increasing the Al concentration involving small displacements of the Mg-site cations. PMID:19036928

  20. Effect of Surface Treatment on Shear Bond Strength between Resin Cement and Ce-TZP/Al2O3

    PubMed Central

    Kim, Jong-Eun; Kim, Jee-Hwan; Shim, June-Sung; Roh, Byoung-Duck

    2016-01-01

    Purpose. Although several studies evaluating the mechanical properties of Ce-TZP/Al2O3 have been published, to date, no study has been published investigating the bonding protocol between Ce-TZP/Al2O3 and resin cement. The aim of this study was to evaluate the shear bond strength to air-abraded Ce-TZP/Al2O3 when primers and two different cement types were used. Materials and Methods. Two types of zirconia (Y-TZP and Ce-TZP/Al2O3) specimens were further divided into four subgroups according to primer application and the cement used. Shear bond strength was measured after water storage for 3 days or 5,000 times thermocycling for artificial aging. Results. The Y-TZP block showed significantly higher shear bond strength than the Ce-TZP/Al2O3 block generally. Primer application promoted high bond strength and less effect on bond strength reduction after thermocycling, regardless of the type of cement, zirconia block, or aging time. Conclusions. Depending on the type of the primer or resin cement used after air-abrasion, different wettability of the zirconia surface can be observed. Application of primer affected the values of shear bond strength after the thermocycling procedure. In the case of using the same bonding protocol, Y-TZP could obtain significantly higher bond strength compared with Ce-TZP/Al2O3. PMID:27382569

  1. High-Performance Wrap-Gated InGaAs Nanowire Field-Effect Transistors with Sputtered Dielectrics

    PubMed Central

    Shen, Li-Fan; Yip, SenPo; Yang, Zai-xing; Fang, Ming; Hung, TakFu; Pun, Edwin Y.B.; Ho, Johnny C.

    2015-01-01

    Although wrap-gated nanowire field-effect-transistors (NWFETs) have been explored as an ideal electronic device geometry for low-power and high-frequency applications, further performance enhancement and practical implementation are still suffering from electron scattering on nanowire surface/interface traps between the nanowire channel and gate dielectric as well as the complicated device fabrication scheme. Here, we report the development of high-performance wrap-gated InGaAs NWFETs using conventional sputtered Al2O3 layers as gate dielectrics, instead of the typically employed atomic layer deposited counterparts. Importantly, the surface chemical passivation of NW channels performed right before the dielectric deposition is found to significantly alleviate plasma induced defect traps on the NW channel. Utilizing this passivation, the wrap-gated device exhibits superior electrical performances: a high ION/IOFF ratio of ~2 × 106, an extremely low sub-threshold slope of 80 mV/decade and a peak field-effect electron mobility of ~1600 cm2/(Vs) at VDS = 0.1 V at room temperature, in which these values are even better than the ones of state-of-the-art NWFETs reported so far. By combining sputtering and pre-deposition chemical passivation to achieve high-quality gate dielectrics for wrap-gated NWFETs, the superior gate coupling and electrical performances have been achieved, confirming the effectiveness of our hybrid approach for future advanced electronic devices. PMID:26607169

  2. Terahertz dynamics of spins and charges in CoFe /Al2O3 multilayers

    NASA Astrophysics Data System (ADS)

    Costa, J. D.; Huisman, T. J.; Mikhaylovskiy, R. V.; Razdolski, I.; Ventura, J.; Teixeira, J. M.; Schmool, D. S.; Kakazei, G. N.; Cardoso, S.; Freitas, P. P.; Rasing, Th.; Kimel, A. V.

    2015-03-01

    The ultrafast laser-induced response of spins and charges in CoFe /Al2O3 multilayers are studied using THz and optical pump-probe spectroscopies. We demonstrate the possibility of ultrafast manipulation of the transport and magnetic properties of the multilayers with femtosecond laser excitation. In particular, using time-resolved THz transmission experiments we found that such an excitation leads to a rapid increase of the THz transmission (i.e., electric resistivity). Our experiments also reveal that femtosecond laser excitation results in the emission of broadband THz radiation. To reveal the origin of the emitted THz radiation, we performed magnetic-dependent measurements of the THz emission. We also compared the observed electric field of the THz radiation to calculations performed using subpicosecond laser-induced demagnetization measurements. The good agreement between the experimentally obtained spectra and the calculations corroborates that the measured THz emission originates from the demagnetization process.

  3. Oxygen diffusion in alpha-Al2O3. Ph.D. Thesis

    NASA Technical Reports Server (NTRS)

    Cawley, J. D.; Halloran, J. W.; Cooper, A. R.

    1984-01-01

    Oxygen self diffusion coefficients were determined in single crystal alpha-Al2O3 using the gas exchange technique. The samples were semi-infinite slabs cut from five different boules with varying background impurities. The diffusion direction was parallel to the c-axis. The tracer profiles were determined by two techniques, single spectrum proton activation and secondary ion mass spectrometry. The SIMS proved to be a more useful tool. The determined diffusion coefficients, which were insensitive to impurity levels and oxygen partial pressure, could be described by D = .00151 exp (-572kJ/RT) sq m/s. The insensitivities are discussed in terms of point defect clustering. Two independent models are consistent with the findings, the first considers the clusters as immobile point defect traps which buffer changes in the defect chemistry. The second considers clusters to be mobile and oxygen diffusion to be intrinsic behavior, the mechanism for oxygen transport involving neutral clusters of Schottky quintuplets.

  4. Structural and magnetic properties of Co68Fe24Zr8/Al2O3 multilayers

    NASA Astrophysics Data System (ADS)

    Lidbaum, Hans; Raanaei, Hossein; Papaioannou, Evangelos Th.; Leifer, Klaus; Hjörvarsson, Björgvin

    2010-02-01

    The structural and magnetic properties of Co68Fe24Zr8/Al2O3 multilayers grown by using magnetron sputtering were investigated with X-ray reflectivity, transmission electron microscopy and magneto-optical Kerr effect. The Co68Fe24Zr8 form amorphous islands when the nominal thickness of the Co68Fe24Zr8 layers is 10 Å, exhibiting an isotropic superparamagnetic behavior. Continuous layers with mostly a nano-crystalline structure are instead formed when the nominal thickness of the Co68Fe24Zr8 layers is increased to 20 Å. The continuous layers exhibit random, in-plane, magnetic anisotropy resulting from the growth process. However, induced uniaxial anisotropy is obtained when growing the sample in the presence of an applied magnetic field, regardless of the combination of amorphous and nano-crystalline material.

  5. Synthesis and characterization of Al-Zn/Al2O3 nano-powder composites.

    PubMed

    Durai, T G; Das, Karabi; Das, Siddhartha

    2007-06-01

    Composites consisting of Al-Zn/Al2O3 have been synthesized using high energy mechanical milling. High energy ball milling increases the sintering rate of the composite powder due to increased diffusion rate. Owing to the finer microstructure, the hardness of the sintered composite produced by using the mechanically milled nanocomposite powder is significantly higher than that of the sintered composite produced by using the as-mixed powder. The mean crystallite size of the matrix has been determined to be 27 nm by Scherrer equation using X-ray diffraction data. The powders have been characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM), and differential thermal analysis (DTA). The effect of high-energy ball milling and subsequent annealing on a mixture of Al and ZnO has also been investigated. DTA result show that the reaction temperature of Al-ZnO decreases with the increase in the ball milling time. PMID:17654976

  6. Role of interfacial transition layers in VO2/Al2O3 heterostructures

    SciTech Connect

    Zhou, Honghui; Chisholm, Matthew F; Yang, Tsung-Han; Pennycook, Stephen J; Narayan, Jagdish

    2011-01-01

    Epitaxial VO2 films grown by pulsed laser deposition (PLD) on c-cut sapphire substrates ((0001) Al2O3) were studied by aberration-corrected scanning transmission electron microscopy (STEM). A number of film/substrate orientation relationships were found and are discussed in the context of the semiconductor-metal transition (SMT) characteristics. A structurally and electronically modified buffer layer was revealed on the interface and was attributed to the interface free-energy minimization process of accommodating the symmetry mismatch between the substrate and the film. This interfacial transition layer is expected to affect the SMT behavior when the interfacial region is a significant fraction of the VO2 film thickness.

  7. CoFe2/Al2O3/PMNPT multiferroic heterostructures by atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Zhou, Ziyao; Grocke, Garrett; Yanguas-Gil, Angel; Wang, Xinjun; Gao, Yuan; Sun, Nianxiang; Howe, Brandon; Chen, Xing

    2016-05-01

    Multiferroic materials and applications allow electric bias control of magnetism or magnetic bias control of polarization, enabling fast, compact, energy-efficient devices in RF/microwave communication systems such as filters, shifters, and antennas; electronics devices such as inductors and capacitors; and other magnetic material related applications including sensors and memories. In this manuscript, we utilize atomic layer deposition technology to grow magnetic CoFe metallic thin films onto PMNPT, with a ˜110 Oe electric field induced ferromagnetic resonance field shift in the CoFe/Al2O3/PMNPT multiferroic heterostructure. Our work demonstrates an atomic layer deposition fabricated multiferroic heterostructure with significant tunability and shows that the unique thin film growth mechanism will benefit integrated multiferroic application in near future.

  8. Explosive fragmentations of alumina (Al2O3) under quasistatic compressive loading

    NASA Astrophysics Data System (ADS)

    Zhang, Qingyan; Jin, Xiaoqing; Zhou, Fenghua

    2015-09-01

    Quasistatic compression tests for alumina (Al2O3) cylinders were conducted for the investigations of the compressive strengths and the dynamic fragmentation properties of the material. We focused on the post-failure dynamic fragmentation phenomenon. Most of the fragments were collected after tests, the shapes and sizes of these fragments were measured and statistically analyzed. The fragments were divided into three types on basis of their shapes and sizes, namely: the flaky medium sized fragments, the tiny debris, and the remaining large blocks, each type of the fragments were formed at different stages of the compressive failure-fragmentation process. The tiny debris were mainly generated from the "explosion" of the cylindrical specimen, in this stage the stored elastic energy within the specimen was released rapidly. The tiny fragments accounted the most part of the fragments in numbers. The average fragment size calculated by the proposed formula agree well with the experimental data.

  9. CVD Fiber Coatings for Al2O3/NiAl Composites

    NASA Technical Reports Server (NTRS)

    Boss, Daniel E.

    1995-01-01

    While sapphire-fiber-reinforced nickel aluminide (Al2O3/NiAl) composites are an attractive candidate for high-temperature structures, the significant difference in the coefficient of thermal expansion between the NiAl matrix and the sapphire fiber creates substantial residual stresses in the composite. This study seeks to produce two fiber-coating systems with the potential to reduce the residual stresses in the sapphire/NiAl composite system. Chemical vapor deposition (CVD) was used to produce both the compensating and compliant-fiber coatings for use in sapphire/NiAl composites. A special reactor was designed and built to produce the FGM and to handle the toxic nickel precursors. This process was successfully used to produce 500-foot lengths of fiber with coating thicknesses of approximately 3 microns, 5 microns, and 10 microns.

  10. Fabrication and properties of functionally graded NiAl/Al2O3 composites

    NASA Technical Reports Server (NTRS)

    Miller, D. P.; Lannutti, J. J.; Noebe, R. D.

    1993-01-01

    A modified sedimentation process was used in the production of a functionally gradient material (FGM), NiAl/Al2O3. A simple finite element model was used to guide our design and fabrication efforts by estimating residual stress states as a function of composite structure. This approach could lead to tailored designs that enhance or avoid specific residual stress states. Thermal cycling tests were factored into the model to predict time dependent or steady-state internal temperature and stress profiles. Four-point bend tests were conducted to establish the mechanical load-displacement behavior of a single interlayer FGM at room temperature, 800 and 1000 K. Room temperature bend strength of the FGM was 3-4 times that of the base NiAl. At elevated temperatures, composite fracture occurred in a gradual, noncatastrophic mode involving NiAl retardation of a succession of cracks originating in the alumina face.

  11. Wear Resistance of Aluminum Matrix Composites Reinforced with Al2O3 Particles After Multiple Remelting

    NASA Astrophysics Data System (ADS)

    Klasik, Adam; Pietrzak, Krystyna; Makowska, Katarzyna; Sobczak, Jerzy; Rudnik, Dariusz; Wojciechowski, Andrzej

    2016-01-01

    Based on previous results, the commercial composites of A359 (AlSi9Mg) alloy reinforced with 22 vol.% Al2O3 particles were submitted to multiple remelting by means of gravity casting and squeeze-casting procedures. The studies were focused on tribological tests, x-ray phase analyses, and microstructural examinations. More promising results were obtained for squeeze-casting method mainly because of the reduction of the negative microstructural effects such as shrinkage porosity or other microstructural defects and discontinuities. The results showed that direct remelting may be treated as economically well-founded and alternative way compared to other recycling processes. It was underlined that the multiple remelting method must be analyzed for any material separately.

  12. CW-OSL measurement protocols using optical fibre Al2O3:C dosemeters.

    PubMed

    Edmund, J M; Andersen, C E; Marckmann, C J; Aznar, M C; Akselrod, M S; Bøtter-Jensen, L

    2006-01-01

    A new system for in vivo dosimetry during radiotherapy has been introduced. Luminescence signals from a small crystal of carbon-doped aluminium oxide (Al2O3:C) are transmitted through an optical fibre cable to an instrument that contains optical filters, a photomultiplier tube and a green (532 nm) laser. The prime output is continuous wave optically stimulated luminescence (CW-OSL) used for the measurement of the integrated dose. We demonstrate a measurement protocol with high reproducibility and improved linearity, which is suitable for clinical dosimetry. A crystal-specific minimum pre-dose is necessary for signal stabilisation. Simple background subtraction only partially removes the residual signal present at long integration times. Instead, the measurement protocol separates the decay curve into three individual components and only the fast and medium components were used. PMID:16990348

  13. Investigation of etching techniques for superconductive Nb/Al-Al2O3/Nb fabrication processes

    NASA Technical Reports Server (NTRS)

    Lichtenberger, A. W.; Lea, D. M.; Lloyd, F. L.

    1993-01-01

    Wet etching, CF4 and SF6 reactive ion etching (RIE), RIE/wet hybrid etching, Cl-based RIE, ion milling, and liftoff techniques have been investigated for use in superconductive Nb/Al-Al2O3/Nb fabrication processes. High-quality superconductor-insulator-superconductor (SIS) junctions have been fabricated using a variety of these etching methods; however, each technique offers distinct tradeoffs for a given process an wafer design. In particular, it was shown that SF6 provides an excellent RIE chemistry for low-voltage anisotropic etching of Nb with high selectivity to Al. The SF6 tool has greatly improved the trilevel resist junction insulation process. Excellent repeatability, selectivity with respect to quartz, and submicron resolution make Cl2 + BCl3 + CHCl3 RIE a very attractive process for trilayer patterning.

  14. Kinetics of F center annealing and colloid formation in Al2O3

    NASA Astrophysics Data System (ADS)

    Kotomin, E. A.; Kuzovkov, V. N.; Popov, A. I.; Vila, R.

    2016-05-01

    The diffusion-controlled kinetics of the F center annealing in Al2O3 (sapphire, corundum) is simulated theoretically for the two regimes: after neutron irradiation when the immobile F centers are annihilated with complementary defects - mobile interstitial oxygen ions, and in thermochemically reduced (additively colored) crystals where mobile F centers aggregate and create the metal colloids. A comparison of the experimental and theoretical kinetics allowed us to estimate the migration energies for the F centers and interstitial oxygen ions. It is obtained that the pre-exponents in diffusion coefficients for defects in different neutron irradiated samples can vary by two orders of magnitude which is attributed by presence of numerous traps for mobile interstitial oxygen ions.

  15. Guiding of low-energy electrons by highly ordered Al2O3 nanocapillaries

    NASA Astrophysics Data System (ADS)

    Milosavljević, A. R.; Víkor, Gy.; Pešić, Z. D.; Kolarž, P.; Šević, D.; Marinković, B. P.; Mátéfi-Tempfli, S.; Mátéfi-Tempfli, M.; Piraux, L.

    2007-03-01

    We report an experimental study of guided transmission of low-energy (200 350eV) electrons through highly ordered Al2O3 nanocapillaries with large aspect ratio ( 140nm diameter and 15μm length). The nanochannel array was prepared using self-ordering phenomena during a two-step anodization process of a high-purity aluminum foil. The experimental results clearly show the existence of the guiding effect, as found for highly charged ions. The guiding of the electron beam was observed for tilt angles up to 12° . As seen for highly charged ions, the guiding efficiency increases with decreasing electron incident energy. The transmission efficiency appeared to be significantly lower than observed for highly charged ions and, moreover, the intensity of transmitted electrons significantly decreases with decreasing impact energy.

  16. Physical characterization of thin ALD-Al 2O 3 films

    NASA Astrophysics Data System (ADS)

    Jakschik, Stefan; Schroeder, Uwe; Hecht, Thomas; Krueger, Dietmar; Dollinger, Guenther; Bergmaier, Andreas; Luhmann, Claudia; Bartha, Johann W.

    2003-04-01

    Aluminum oxide was deposited using atomic layer deposition on either a silicon oxide or a silicon nitride interface. Water vapor or ozone were used as oxidation precursors. The structural properties of these films were investigated by time-of-flight secondary-ion-mass-spectroscopy (ToF-SIMS), X-ray photoelectron spectroscopy (XPS) and elastic recoil detection (ERD). Special attention was given to contamination issues of the film and the interface, bonding conditions and temperature influence on diffusion. The results suggest that the silicon most likely diffused along grain boundaries of polycrystalline Al 2O 3. Carbon and hydrogen were located at the interface and furthermore hydrogen diffused out of the film to some extent due to anneal. Carbon content in the layer was reduced when using O 3 as an oxidant. The formation of metallic aluminum clusters was not observed for any of the investigated process conditions.

  17. Stellar Sapphires: The Properties and Origins of Presolar Al2O3 in Meteorites

    NASA Astrophysics Data System (ADS)

    Nittler, Larry R.; Alexander, O'D.; Gao, Xia; Walker, Robert M.; Zinner, Ernst

    1997-07-01

    Thirty-seven isotopically highly anomalous presolar Al2O3 grains and one presolar MgAl2O4 grain from a separate of the Tieschitz H3.6 ordinary chondrite were identified out of 17,000 isotopically normal refractory oxide grains by an automatic 16O/18O low mass resolution ion-imaging mapping technique in the ion microprobe. Eight additional presolar Al2O3 grains were found by high mass resolution ion probe measurements of all three stable O isotopes in individual grains, including several that would have been missed by the ion-imaging search. Forty-five of the grains were analyzed for their 16O/17O and 16O/18O ratios. Twenty-four grains were also analyzed for Al-Mg and 17 of them have large excesses of 26Mg, attributable to the radioactive decay of 26Al. The highly anomalous isotopic composition of the grains is evidence for their presolar, stellar origin. The 46 oxide grains of this study together with 42 previously identified presolar grains were divided into four groups. These groups most likely comprise grains from distinct types of stellar sources. Group 1 grains have 17O excesses and moderate 18O depletions, relative to solar, and many of them exhibit 26Mg excesses as well. Group 2 grains have 17O excesses, large 18O depletions, and high inferred 26Al/27Al ratios. Group 3 grains have solar or higher 16O/17O and 16O/18O ratios. Group 4 grains have 17O and 18O enrichments. One Al2O3 grain of this study, T54, has an 16O/17O ratio of 71, lower than any previously observed, and 16O/18O much greater than the solar value. The O-isotopic compositions of Group 1 and Group 3 grains are consistent with an origin in O-rich red giant stars, which have undergone the first dredge-up. The range of O-isotopic ratios of these groups requires multiple stellar sources of different masses and initial isotopic compositions and is well explained by a combination of Galactic chemical evolution and first dredge-up models. The inferred 26Al/27Al ratios of many of these grains indicate

  18. Nucleation of ordered Fe islands on Al 2O 3/Ni 3Al(1 1 1)

    NASA Astrophysics Data System (ADS)

    Lehnert, A.; Krupski, A.; Degen, S.; Franke, K.; Decker, R.; Rusponi, S.; Kralj, M.; Becker, C.; Brune, H.; Wandelt, K.

    2006-05-01

    Scanning tunneling microscopy (STM) has been used to investigate the nucleation and stability of iron clusters on the Al 2O 3/Ni 3Al(1 1 1) surface as a function of coverage and annealing temperature. We show that atomic beam deposition of iron leads to hexagonally ordered cluster arrangements with a distance of 24 Å between the clusters evidencing the template effect of the alumina film. The shape of the iron clusters is two-dimensional (2D) at deposition temperatures from 130 K to 160 K and three-dimensional (3D) at 300 K. However, the 2D iron clusters grown between 130 K and 160 K are stable up to 350 K.

  19. Tribological properties of thermally sprayed TiAl-Al2O3 composite coating

    NASA Astrophysics Data System (ADS)

    Salman, A.; Gabbitas, B.; Li, J.; Zhang, D.

    2009-08-01

    The use of thermal spray coatings provides protection to the surfaces operating in severe environments. The main goal of the current work is to investigate the possibility of using a high velocity oxy fuel (HVOF) thermally sprayed wear resistant TiAl/Al2O3 coating on tool steel (H13) which is used for making dies for aluminium high pressure die casting. A feedstock of TiAl/Al2O3 composite powder was produced from a mixture of Al and TiO2 powders by high energy mechanical milling, followed by a thermal reaction process. The feedstock was then thermally sprayed using a high velocity oxy-fuel (HVOF) technique onto H13 steel substrates to produce a composite coating. The present study describes and compares the tribological properties such as friction and sliding wear rate of the coating both at room and high temperature (700°C). The results showed that the composite coating has lower wear rate at high temperature (700°C) than the uncoated H13 sample. At Room temperature without using lubricant there is no much significant difference between the wear rate of the coated and uncoated samples. The experimental results showed that the composite coating has great potential for high temperature application due to its lower wear rate at high temperature in comparison with the uncoated sample at the same temperature. The composite coating was characterized using scanning electron microscopy (SEM), optical microscopy and X-ray diffractometry (XRD). This paper reports the experimental observations and discusses the wear resistance performance of the coatings at room and high temperatures.

  20. Ni-Al2O3 and Ni-Al composite high-aspect-ratio microstructures

    NASA Astrophysics Data System (ADS)

    Wang, Tao; Sorrell, Melford; Kelly, Kevin W.; Ma, Evan

    1998-09-01

    High-aspect-ratio microstructures (HARMs) have a variety of potential applications in heat transfer, fluid mechanics, catalysts and other microelectromechanical systems (MEMS). The aim of this work is to demonstrate the feasibility to fabricate high performance particulate metal-matrix composite and intermetallic micromechanical structures using the LIGA process. Well-defined functionally graded Ni-Al2O3 and Ni-Al high-aspect-ratio microposts were electroformed into lithographically patterned PMMA holes from a nickel sulfamate bath containing submicron alumina and a diluted Watts bath containing microsized aluminum particles, respectively. SEM image analysis showed that the volume fraction of the alumina reached up to around 30% in the Ni-Al2O3 deposit. The Vickers microhardness of these composites is in the range of 418 through 545, which is higher than those of nickel microstructures from a similar particle-free bath and other Ni-based electrodeposits. In the work on Ni-Al electroplating, a newly developed diluted Watts bath was used to codeposit micron-sized aluminum particles. The intermetallic compound Ni3Al was formed by the reaction of nickel matrices and aluminum particles through subsequent annealing at 630 degrees Celsius. WDS and XRD analyses confirmed that the annealed coating is a two-phase (Ni-Ni3Al) composite. The maximum aluminum volume fraction reached 19% at a cathode current density of 12 mA cm-2, and the Vickers microhardness of the as-deposited coatings is in the range 392 - 515 depending on the amount of aluminum incorporated.

  1. Latent tracks and associated strain in Al2O3 irradiated with swift heavy ions

    NASA Astrophysics Data System (ADS)

    O'Connell, J. H.; Rymzhanov, R. A.; Skuratov, V. A.; Volkov, A. E.; Kirilkin, N. S.

    2016-05-01

    The morphology of latent ion tracks induced by high energy heavy ions in Al2O3 was investigated using a combination of high resolution transmission electron microscopy (HRTEM), exit wave reconstruction, geometric phase analysis and numerical simulations. Single crystal α-Al2O3 crystals were irradiated with 167 MeV Xe ions along the c-axis to fluences between 1 × 1010 and 1 × 1013 cm-2. Planar TEM lamella were prepared by focused ion beam (FIB) and geometrical phase analysis was performed on the phase image of the reconstructed complex electron wave at the specimen exit surface in order to estimate the latent strain around individual track cores. In addition to the experimental data, the material excitation in a SHI track was numerically simulated by combining Monte-Carlo code, describing the excitation of the electronic subsystem, with classical molecular dynamics of the lattice atoms. Experimental and simulation data both showed that the relaxation of the excess lattice energy results in the formation of a cylinder-like disordered region of about 4 nm in diameter consisting of an underdense core surrounded by an overdense shell. Modeling of the passage of a second ion in the vicinity of this disordered region revealed that this damaged area can be restored to a near damage free state. The estimation of a maximal effective distance of recrystallization between the ion trajectories yields values of about 6-6.5 nm which are of the same order of magnitude as those estimated from the saturation density of latent ion tracks detected by TEM.

  2. Microstructure and mechanical properties of Al2O3 composites with surface-treated carbon nanotubes (CNTs): dispersibility of modified carbon nanotubes (CNTs) on Al2O3 matrix.

    PubMed

    Kim, Eun-Hee; Jung, Yeon-Gil; Paik, Ungyu

    2012-02-01

    Aluminum oxide (Al2O3) matrix have been reinforced by the multi-walled carbon nanotubes (MWCNTs) to overcome the inherent brittleness of Al2O3 matrix. In order to increase mechanical properties of MWCNTs-Al2O3 composites, MWCNTs need to be well dispersed and individually incorporated in Al2O3 matrix. In this work, aluminum hydroxide (Al(OH)3) used as a Al2O3 precursor and MWCNTs were mixed in an aqueous solution for the homogeneous mixing of hetero-particles, as functions of the content of MWCNTs and the potential hydrogen (pH) of Al(OH)3 suspension. Firstly, MWCNTs were purified and modified by an acid reagent, inducing that the dispersibility of MWCNTs is increased in an aqueous solution by carboxylic group given on the surface of MWCNTs. The modified MWCNTs were added in the Al(OH)3 suspension, and then the mixture was filtered at room temperature. The filtered powders were formed using an uniaxial pressing and then densified by a pressureless heat treatment. As the pH is decreased the Al(OH)3 particles are well dispersed in an aqueous solution, due to the increment of repulsive force between particles with a same surface charge. MWCNTs are individually incorporated into Al2O3 matrix up to 1 vol.% MWCNTs, whereas MWCNTs are aggregated at the composite with 3 vol.% MWCNTs. Therefore, control of the pH and the MWCNTs content are key factors to be considered for the fabrication of MWCNTs-Al2O3 composites with high functional properties. PMID:22629950

  3. Thickness effect on the optical and morphological properties in Al2O3/ZnO nanolaminate thin films prepared by atomic layer deposition

    NASA Astrophysics Data System (ADS)

    López, J.; Martínez, J.; Abundiz, N.; Domínguez, D.; Murillo, E.; Castillón, F. F.; Machorro, R.; Farías, M. H.; Tiznado, H.

    2016-02-01

    In this work, we studied the optical and morphological properties of ultrathin nanolaminate films based on Al2O3/ZnO (AZ) bilayers stack. The films were deposited on Si (100) by means of thermal atomic layer deposition (ALD) technique. The bilayer thicknesses (ratio = 1:1) were 0.2, 1, 2, 4, 10 and 20 nm. Refractive index (n) and band gap (Eg) of each nanolaminate were studied via spectroscopic ellipsometry (SE), and spectral reflectance ultraviolet-visible spectroscopy (UV-vis). Surface morphology and roughness parameters of the nanolaminates were measured by Atomic Force Microscopy (AFM). The optical and morphological properties were shown highly dependent on the bilayer thickness. Ellipsometric data treated through the Cody-Lorentz optical model revealed that the refractive index decreases for thinner bilayers. A sharp intensity decay of refractive index and peaks at the UV region (200-400 nm) indicated increased transparency for thinner bilayers. It is also shown that the band gap is tunable. The maximum band gap value was 4.8 eV. These results reveal that ZnO combined with Al2O3 as bilayers stack can be converted into a dielectric material with enhanced band gap, opening the possibility for new optical and dielectric applications.

  4. Kinetics for Steam and CO2 Reforming of Methane Over Ni/La/Al2O3 Catalyst.

    PubMed

    Park, Myung Hee; Choi, Bong Kwan; Park, Yoon Hwa; Moon, Dong Ju; Park, Nam Cook; Kim, Young Chul

    2015-07-01

    Kinetic studies of mixed (steam and dry) reforming of methane on Ni/La/Al2O3 and Ni/La-Co (1, 3 wt%)/Al2O3 catalysts were performed in an atmospheric fixed-bed reactor. Kinetic parameters for the mixed reforming over these catalysts were obtained under reaction conditions free from heat and mass transfer limitations. Variables for the mixed reforming were the reaction temperature and partial pressure of reactants. The fitting of the experimental data for the rate of methane conversion, rCH4, using the power law rate equation rCH4 = k(PrCH4)α(PCO2)β(PH2O)γ showed that the reaction orders α, β, and γ are steady and obtained values equal to α = 1, β = 0, and γ = 0. In other words, among CH4, CO2, H2O, and H2, only CH4 reaction orders were not zero and they were affected by the promoters. The apparent activation energy on catalysts Ni/La/Al2O3, Ni/La-Co (1)/Al2O3 and Ni/La-Co (3)/Al2O3 is 85.2, 93.8, and 99.4 kJ/mol, respectively. The addition of Co to Ni/La/Al2O3 was increased the apparent activation energy of the mixed reforming reaction. And the Ni/La-Co (3 wt%)/Al2O3 catalyst showed the highest reforming activity and apparent activation energy. The Co promoters can increase the apparent activation energy of mixed reforming of methane. PMID:26373118

  5. Visible-light-driven photocatalysts Ag/AgCl dispersed on mesoporous Al2O3 with enhanced photocatalytic performance.

    PubMed

    Feng, Zhouzhou; Yu, Jiajie; Sun, Dongping; Wang, Tianhe

    2016-10-15

    In this paper, Ag/AgCl and Ag/AgCl/Al2O3 photocatalysts were synthesized via a precipitation reaction between NaCl and CH3COOAg or Ag(NH3)2NO3, wherein Ag/AgCl was immobilized into mesoporous Al2O3 medium. The Ag/AgCl-based nanostructures were characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), photoluminescence (PL) spectra, and so on. The photocatalysts displayed excellent photocatalytic activity for the degradations of methyl orange (MO) and methylene blue (MB) pollutants under visible light irradiation. The Ag/AgCl(CH3COOAg)/Al2O3 sample exhibited the best photocatalytic performance, degrading 99% MO after 9min of irradiation, which was 1.1 times, 1.22 times and 1.65 times higher than that of Ag/AgCl(Ag(NH3)2NO3)/Al2O3, Ag/AgCl(CH3COOAg) and Ag/AgCl(Ag(NH3)2NO3) photocatalyst, respectively. Meanwhile, Ag/AgCl(CH3COOAg)/Al2O3 also showed excellent capability of MB degradation. Compared to the data reported for Ag/AgCl/TiO2, the Ag/AgCl/Al2O3 prepared in this work exhibited a good performance for the degradation of methyl orange (MO). The results suggest that the dispersion of Ag/AgCl on mesoporous Al2O3 strongly affected their photocatalytic activities. O2(-), OH radicals and Cl(0) atoms are main active species during photocatalysis. PMID:27442145

  6. Gate dielectric development for flexible electronics

    SciTech Connect

    Joshi, P. C.; Voutsas, A. T.; Hartzell, J. W.

    2007-07-15

    Thin film transistors integrated on flexible substrates are becoming increasingly attractive for low cost displays, sensors, and rf communication applications. The successful development of the flexible devices will be dictated by the enhancement in the thermal stability of the substrates and the low temperature (<300 deg. C) processing of the gate dielectric. The plasma-enhanced chemical-vapor deposition (PECVD) technique has successfully met the demands of the gate dielectric for display devices at processing temperatures lower than 600 deg. C. However, a further reduction in the processing temperatures below 300 deg. C is essential to realize low cost, highly functional devices on flexible substrates. The low temperature processing of gate dielectric films necessitates the development of processes and techniques with plasma controlled reaction kinetics dominating the thin film growth rather than the thermal state of the substrate. In the present work, the authors report on the processing of high quality gate dielectric films by high density PECVD technique at process temperatures lower than 300 deg. C. The bulk and interfacial electrical quality and reliability of the metal-oxide-semiconductor capacitors as a function of process temperature are discussed in this article. A comparison with the high temperature gate oxide films deposited by PECVD technique employing capacitively coupled plasma source has been made to establish the film quality and reliability. The films processed at low temperatures have shown good electrical performance and reliability as evaluated in terms of the leakage current, flatband voltage, midgap interface trap concentration, and bias temperature stress reliability characteristics.

  7. Ultrahigh-pressure acoustic wave velocities of SiO2-Al2O3 glasses up to 200 GPa

    NASA Astrophysics Data System (ADS)

    Ohira, Itaru; Murakami, Motohiko; Kohara, Shinji; Ohara, Koji; Ohtani, Eiji

    2016-12-01

    Extensive experimental studies on the structure and density of silicate glasses as laboratory analogs of natural silicate melts have attempted to address the nature of dense silicate melts that may be present at the base of the mantle. Previous ultrahigh-pressure experiments, however, have been performed on simple systems such as SiO2 or MgSiO3, and experiments in more complex system have been conducted under relatively low-pressure conditions below 60 GPa. The effect of other metal cations on structural changes that occur in dense silicate glasses under ultrahigh pressures has been poorly understood. Here, we used a Brillouin scattering spectroscopic method up to pressures of 196.9 GPa to conduct in situ high-pressure acoustic wave velocity measurements of SiO2-Al2O3 glasses in order to understand the effect of Al2O3 on pressure-induced structural changes in the glasses as analogs of aluminosilicate melts. From 10 to 40 GPa, the transverse acoustic wave velocity ( V S ) of Al2O3-rich glass (SiO2 + 20.5 mol% Al2O3) was greater than that of Al2O3-poor glass (SiO2 + 3.9 mol% Al2O3). This result suggests that SiO2-Al2O3 glasses with higher proportions of Al ions with large oxygen coordination numbers (5 and 6) become elastically stiffer up to 40 GPa, depending on the Al2O3 content, but then soften above 40 GPa. At pressures from 40 to ~100 GPa, the increase in V S with increasing pressure became less steep than below 40 GPa. Above ~100 GPa, there were abrupt increases in the P-V S gradients ( dV S /dP) at 130 GPa in Al2O3-poor glass and at 116 GPa in Al2O3-rich glass. These changes resemble previous experimental results on SiO2 glass and MgSiO3 glass. Given that changes of dV S / dP have commonly been related to changes in the Si-O coordination states in the glasses, our results, therefore, may indicate a drastic structural transformation in SiO2-Al2O3 glasses above 116 GPa, possibly associated with an average Si-O coordination number change to higher than 6. Compared

  8. Analysis of the co-deposition of Al2O3 particles with nickel by an electrolytic route: The influence of organic additives presence and Al2O3 concentration

    NASA Astrophysics Data System (ADS)

    Temam, H. B.; Temam, E. G.

    2016-04-01

    Alloy coatings were prepared by co-deposition of Al2O3 particles in Ni matrix on carbon steel substrate from nickel chloride bath in which metallic powders were held in suspension. The influence of metal powder amount in the bath on chemical composition, morphology, thickness, microhardness and corrosion behavior of obtained coatings, has been investigated. It was shown that the presence of Al2O3 particles in deposit greatly improves the hardness and the wear resistance of alloy coatings. Characterization by microanalysis (EDX) of the various deposits elaborated confirms that the rate of particles incorporated increases as the concentration of solid particles increasing. The results showed that the presence of organic additives in Ni-Al2O3 electrolyte deposition led to an increase in the hardness and corrosion resistance of the deposits.

  9. Multidisciplinary Investigation of the Structural and Electronic Properties of the Pt/ γ-Al2O3 interface

    NASA Astrophysics Data System (ADS)

    Yang, Judith; Zhu, Qing; Bonifacio, Cecile; Kas, Josh; Ayoola, Henry; Kisslinger, Kim; Su, Dong; Vila, Fernando; House, Stephen; Stach, Eric; Rehr, John; Saidi, Wissam; University of Pittsburgh Team; University of Washington Team; Brookhaven National Laboratory Team

    Pt/ γ-Al2O3 is arguably the most important heterogeneous catalyst system. Despite the numerous studies on this system, the detailed structural and electronic properties of this interface remain uncertain. Through controlled oxidation of NiAl (110), we were able to obtain single crystalline Pt/ γ-Al2O3 thin films. We also prepared Pt/ γ-Al2O3 samples. STEM observations show that use of cryo-electron microscopy techniques prevented electron-beam damage, including direct sample damage, and changes in the EELS oxygen K pre-peak (~532 eV). The oxygen K pre-peak was consistently present in spectra taken at the Pt/ γ-Al2O3 interface at cryo-temperatures, but not in those acquired at room temperature. The theoretically calculated EELS oxygen K signals for the Pt on (110) Pt/ γ-Al2O3 exhibited a similar pre-peak at 532 eV correlating to the experimental EELS oxygen K data, and we attribute to this feature to the formation of Pt-O complex. This points out an important factor in understanding the reactivity of this catalysis.

  10. Tensile Strength and Microstructure of Al2O3-ZrO2 Hypo-Eutectic Fibers Studied

    NASA Technical Reports Server (NTRS)

    Farmer, Serene C.; Sayir, Ali

    2001-01-01

    Oxide eutectics offer high-temperature strength retention and creep resistance in oxidizing environments. Al2O3-ZrO2 eutectic strengths have been studied since the 1970's. Directionally solidified oxide eutectics exhibit improved resistance to slow crack growth and excellent strength retention at high temperatures up to 1400 C. Materials studied typically contain Y2O3 to metastably retain the high-temperature cubic and tetragonal polymorphs at room temperature. Al2O3-ZrO2 is of fundamental interest for creep studies because it combines a creep-resistant material, Al2O3, with a very low creep resistance material, ZrO2. Results on mechanical properties and microstructures of these materials will be used to define compositions for creep testing in future work. Substantial variations from the eutectic alumina to zirconia ratio can be tolerated without a loss in room-temperature strength. The effect of increasing Y2O3 addition on the room-temperature tensile strength of an Al2O3-ZrO2 material containing excess Al2O3 was examined at the NASA Glenn Research Center, where the materials were grown using Glenn's world-class laser growth facilities.

  11. Development of Ni-Mo/Al2O3 catalyst for reverse water gas shift (RWGS) reaction.

    PubMed

    Kharaji, Abolfazl Gharibi; Shariati, Ahmad; Ostadi, Mohammad

    2014-09-01

    In the present study, Mo/Al2O3 catalyst was prepared using impregnation method. Then it was promoted with Ni ions to produce Ni-Mo/Al2O3 catalyst. The structures of the catalysts were studied using X-ray diffraction (XRD), Energy dispersive X-ray (EDAX), Brunauer-Emmett-Teller (BET), X-ray photoelectron spectroscopy (XPS), CO chemisorption, temperature programmed reduction of hydrogen (H2-TPR) and scanning electron microscope (SEM) techniques. Catalytic performances of the two catalysts were investigated in a fixed-bed reactor for RWGS reaction. The results indicated that addition of nickel promoter to Mo/Al2O3 catalyst enhances its activity. It is reasonable for the electron deficient state of the Ni species and existence of NiMoO4 phase to possess high activity in RWGS reaction. Stability test of Ni-Mo/Al2O3 catalyst was carried out in a fixed bed reactor and a high CO2 conversion for 60 h time on stream was demonstrated. This study introduces a new catalyst, Ni-Mo/Al2O3, with high activity and stability for RWGS reaction. PMID:25924339

  12. Microstructure and properties of Ni-Co/nano-Al 2O 3 composite coatings by pulse reversal current electrodeposition

    NASA Astrophysics Data System (ADS)

    Chang, L. M.; An, M. Z.; Guo, H. F.; Shi, S. Y.

    2006-12-01

    Ni-Co/nano-Al 2O 3 (Ni-Co/Al 2O 3) composite coatings were prepared under pulse reversal current (PRC) and direct current (dc) methods respectively. The microstructure of coatings was characterized by means of XRD, SEM and TEM. Both the Ni-Co alloy and composite coatings exhibit single phase of Ni matrix with face-centered cubic (fcc) crystal structure, and the crystal orientation of the Ni-Co/Al 2O 3 composite coating was transformed from crystal face (2 0 0) to (1 1 1) compared with alloy coatings. The hardness, anti-wear property and macro-residual stress were also investigated. The results showed that the microstructure and performance of the coatings were greatly affected by Al 2O 3 content and the electrodeposition methods. With the increasing of Al 2O 3 content, the hardness and wear resistance of the composite coatings enhanced. The PRC composite coatings exhibited compact surface, high hardness, better wear resistance and lower macro-residual stress compared with that of the dc composite coatings.

  13. Effect of pH on the holographic properties of Al2O3 nanoparticle dispersed acrylate photopolymer

    NASA Astrophysics Data System (ADS)

    Li, Yun-Xi; Li, Chun-Liu; Huang, Ming-Ju

    2014-03-01

    Several different pH of Al2O3 nano-fluid were prepared using dispersant and doped into polyvinyl alcohol (PVA)/acrylamide (AA) based photopolymers where the photopolymers were exposed with 647 nm Ar+Kr+ laser to study its holographic properties. The research shows that the incorporation of Al2O3 nanoparticles (NPs) improves the holographic characteristics of sample, where the pH has an effect to the dispersion of Al2O3 NPs in the photopolymer. When the pH of Al2O3 nano-fluid is about 7, the diffraction efficiency of the sample can be raised to 93.8%, the maximum refractive index modulation can be increased to 2.28×10-3, the shrinkage can be depressed to 0.8%, the Bragg mismatch is 0.04°, and the concentration of 10 nm Al2O3 nano-fluid modified by high definition (HD) dispersant must be 1.02×10-3molṡL-1.

  14. Nano porous Al2O3-TiO2 thin film based humidity sensor prepared by spray pyrolysis technique

    NASA Astrophysics Data System (ADS)

    Chandrashekara, H. D.; Angadi, Basavaraj; Ravikiran, Y. T.; Poornima, P.; Shashidhar, R.; Murthy, L. C. S.

    2016-05-01

    The nano porous surface structured TiO2 and Al2O3-TiO2 thin films were prepared using spray pyrolysis technique at 350°C. The XRD pattern of Al2O3-TiO2 film shows anatase phase and mixed phase of Al2TiO5. The surface morphology of films show a uniformly distributed nano porous structure. The elemental analysis through EDAX shows good stoichiometry. The sensitivity for humidity sensing were determined for both films of TiO2 and Al2O3-TiO2 and corresponding values are found to be 74.2% and 84.02%, this result reveal that Al2O3-TiO2 films shows higher sensing percent than the TiO2 due to the nano porous surface nature. The Al2O3-TiO2 film shows fast response time and long recovery time than the TiO2 film, this may be due to the meso-porous morphology of these films.

  15. Methanobactin-mediated synthesis of gold nanoparticles supported over Al2O3 toward an efficient catalyst for glucose oxidation.

    PubMed

    Xin, Jia-Ying; Lin, Kai; Wang, Yan; Xia, Chun-Gu

    2014-01-01

    Methanobactin (Mb) is a copper-binding peptide that appears to function as an agent for copper sequestration and uptake in methanotrophs. Mb can also bind and reduce Au(III) to Au(0). In this paper, Au/Al2O3 catalysts prepared by a novel incipient wetness-Mb-mediated bioreduction method were used for glucose oxidation. The catalysts were characterized, and the analysis revealed that very small gold nanoparticles with a particle size <4 nm were prepared by the incipient wetness-Mb-mediated bioreduction method, even at 1.0% Au loading (w/w). The influence of Au loading, calcination temperature and calcination time on the specific activity of Au/Al2O3 catalysts was systematically investigated. Experimental results showed that decomposing the Mb molecules properly by calcinations can enhance the specific activity of Au/Al2O3 catalysts, though they acted as reductant and protective agents during the catalyst preparation. Au/Al2O3 catalysts synthesized by the method exhibited optimum specific activity under operational synthesis conditions of Au loading of 1.0 wt % and calcined at 450 °C for 2 h. The catalysts were reused eight times, without a significant decrease in specific activity. To our knowledge, this is the first attempt at the preparation of Au/Al2O3 catalysts by Mb-mediated in situ synthesis of gold nanoparticles. PMID:25429424

  16. Assimilation Behavior of Calcium Ferrite and Calcium Diferrite with Sintered Al2O3 and MgO

    NASA Astrophysics Data System (ADS)

    Long, Hongming; Wu, Xuejian; Chun, Tiejun; Di, Zhanxia; Yu, Bin

    2016-06-01

    In this study, the assimilation behaviors between calcium ferrite (CF), calcium diferrite (CF2) and sintered Al2O3, and MgO were explored by an improved sessile drop technique, and the interfacial microstructure was discussed. The results indicated that the apparent contact angles of CF slag on Al2O3 and MgO substrate were 15.7 and 5.5 deg, and the apparent contact angles of CF2 slag on Al2O3 and MgO substrate were 17.9 and 7.2 deg, respectively. Namely, CF and CF2 slag were wetting well with Al2O3 and MgO substrate. The dissolution of Al2O3 substrate into the CF and CF2 slag was found to be the driving force of the wetting process. For the CF-MgO and CF2-MgO substrate systems, CaO contrarily distributed with MgO after wetting. For the CF-MgO system, after wetting, the slag was composed of CF and C2F, and most of the Fe2O3 permeated into substrate and formed two permeating layers.

  17. Methanobactin-Mediated Synthesis of Gold Nanoparticles Supported over Al2O3 toward an Efficient Catalyst for Glucose Oxidation

    PubMed Central

    Xin, Jia-Ying; Lin, Kai; Wang, Yan; Xia, Chun-Gu

    2014-01-01

    Methanobactin (Mb) is a copper-binding peptide that appears to function as an agent for copper sequestration and uptake in methanotrophs. Mb can also bind and reduce Au(III) to Au(0). In this paper, Au/Al2O3 catalysts prepared by a novel incipient wetness-Mb-mediated bioreduction method were used for glucose oxidation. The catalysts were characterized, and the analysis revealed that very small gold nanoparticles with a particle size <4 nm were prepared by the incipient wetness-Mb-mediated bioreduction method, even at 1.0% Au loading (w/w). The influence of Au loading, calcination temperature and calcination time on the specific activity of Au/Al2O3 catalysts was systematically investigated. Experimental results showed that decomposing the Mb molecules properly by calcinations can enhance the specific activity of Au/Al2O3 catalysts, though they acted as reductant and protective agents during the catalyst preparation. Au/Al2O3 catalysts synthesized by the method exhibited optimum specific activity under operational synthesis conditions of Au loading of 1.0 wt % and calcined at 450 °C for 2 h. The catalysts were reused eight times, without a significant decrease in specific activity. To our knowledge, this is the first attempt at the preparation of Au/Al2O3 catalysts by Mb-mediated in situ synthesis of gold nanoparticles. PMID:25429424

  18. Temperature-dependent elastic stiffness constants of α- and θ-Al2O3 from first-principles calculations.

    PubMed

    Shang, Shun-Li; Zhang, Hui; Wang, Yi; Liu, Zi-Kui

    2010-09-22

    Temperature-dependent elastic stiffness constants (c(ij)s), including both the isothermal and isoentropic ones, have been predicted for rhombohedral α-Al(2)O(3) and monoclinic θ-Al(2)O(3) in terms of a quasistatic approach, i.e., a combination of volume-dependent c(ij)s determined by a first-principles strain versus stress method and direction-dependent thermal expansions obtained by first-principles phonon calculations. A good agreement is observed between the predictions and the available experiments for α-Al(2)O(3), especially for the off-diagonal elastic constants. In addition, the temperature-dependent c(ij)s predicted herein, in particular the ones for metastable θ-Al(2)O(3), enable the stress analysis at elevated temperatures in thermally grown oxides containing α- and θ-Al(2)O(3), which are crucial to understand the failure of thermal barrier coatings in gas-turbine engines. PMID:21403195

  19. Comparing the Thermodynamic Behaviour of Al(1)+ZrO2(s) to Al(1)+Al2O3(s)

    NASA Technical Reports Server (NTRS)

    Copland, Evan

    2004-01-01

    In an effort to better determine the thermodynamic properties of Al(g) and Al2O(g). the vapor in equilibrium with Al(l)+ZrO2(s) was compared to the vapor in equilibrium with Al(l)+Al2O3(s) over temperature range 1197-to-1509K. The comparison was made directly by Knudsen effusion-cell mass spectrometry with an instrument configured for a multiple effusion-cell vapor source (multi-cell KEMS). Second law enthalpies of vaporization of Al(g) and Al2O(g) together with activity measurements show that Al(l)+ZrO2(s) is thermodynamically equivalent to Al(l)+Al2O3(s), indicating Al(l) remained pure and Al2O3(s) was present in the ZrO2-cell. Subsequent observation of the Al(l)/ZrO2 and vapor/ZrO2 interfaces revealed a thin Al2O3-layer had formed, separating the ZrO2-cell from Al(l) and Al(g)+Al2O(g), effectively transforming it into an Al2O3 effusion-cell. This behavior agrees with recent observations made for Beta-NiAl(Pt) alloys measured in ZrO2 effusion-cell.

  20. Passivation Effect of Atomic Layer Deposition of Al2O3 Film on HgCdTe Infrared Detectors

    NASA Astrophysics Data System (ADS)

    Zhang, Peng; Ye, Zhen-Hua; Sun, Chang-Hong; Chen, Yi-Yu; Zhang, Tian-Ning; Chen, Xin; Lin, Chun; Ding, Ring-Jun; He, Li

    2016-09-01

    The passivation effect of atomic layer deposition of (ALD) Al2O3 film on a HgCdTe infrared detector was investigated in this work. The passivation effect of Al2O3 film was evaluated by measuring the minority carrier lifetime, capacitance versus voltage ( C- V) characteristics of metal-insulator-semiconductor devices, and resistance versus voltage ( R- V) characteristics of variable-area photodiodes. The minority carrier lifetime, C- V characteristics, and R- V characteristics of HgCdTe devices passivated by ALD Al2O3 film was comparable to those of HgCdTe devices passivated by e-beam evaporation of ZnS/CdTe film. However, the baking stability of devices passivated by Al2O3 film is inferior to that of devices passivated by ZnS/CdTe film. In future work, by optimizing the ALD Al2O3 film growing process and annealing conditions, it may be feasible to achieve both excellent electrical properties and good baking stability.

  1. Passivation Effect of Atomic Layer Deposition of Al2O3 Film on HgCdTe Infrared Detectors

    NASA Astrophysics Data System (ADS)

    Zhang, Peng; Ye, Zhen-Hua; Sun, Chang-Hong; Chen, Yi-Yu; Zhang, Tian-Ning; Chen, Xin; Lin, Chun; Ding, Ring-Jun; He, Li

    2016-06-01

    The passivation effect of atomic layer deposition of (ALD) Al2O3 film on a HgCdTe infrared detector was investigated in this work. The passivation effect of Al2O3 film was evaluated by measuring the minority carrier lifetime, capacitance versus voltage (C-V) characteristics of metal-insulator-semiconductor devices, and resistance versus voltage (R-V) characteristics of variable-area photodiodes. The minority carrier lifetime, C-V characteristics, and R-V characteristics of HgCdTe devices passivated by ALD Al2O3 film was comparable to those of HgCdTe devices passivated by e-beam evaporation of ZnS/CdTe film. However, the baking stability of devices passivated by Al2O3 film is inferior to that of devices passivated by ZnS/CdTe film. In future work, by optimizing the ALD Al2O3 film growing process and annealing conditions, it may be feasible to achieve both excellent electrical properties and good baking stability.

  2. XAFS analysis for quantification of the gallium coordinations in Al2O3-supported Ga2O3 photocatalysts

    NASA Astrophysics Data System (ADS)

    Akatsuka, M.; Yoshida, T.; Yamamoto, N.; Yamamoto, M.; Ogawa, S.; Yagi, S.

    2016-05-01

    Ga2O3 loaded Al2O3 samples (Ga2O3/Al2O3) were prepared to change coordination structures around Ga atoms. Ga K-edge XANES spectra of the Ga2O3/Al2O3 samples showed two peaks assigned to Ga atoms having tetrahedral coordination structure (Ga(t)) and octahedral one (Ga(o)). Curve-fitting analysis of XANES spectra was carried out with a set of pseudo- Voight and arctangent functions, and the fractions of Ga(t) and Ga(o) were quantitatively estimated from the ratio of the peak areas. EXAFS curve-fitting analysis also evaluated the fractions of Ga(t) and Ga(o) and they were in good agreement with those obtained by XANES analysis. It was revealed that the fraction of Ga(t) increased with the decrease in the loading amount of Ga2O3 due to the interaction of Ga species with Al2O3. The fractions of Ga(t) and Ga(o) might relate to the photocatalytic activity for CO2 reduction with H2O over the Ga2O3/Al2O3 samples.

  3. Comparative study of gamma ray shielding and some properties of PbO-SiO2-Al2O3 and Bi2O3-SiO2-Al2O3 glass systems

    NASA Astrophysics Data System (ADS)

    Singh, K. J.; Kaur, Sandeep; Kaundal, R. S.

    2014-03-01

    Gamma-ray shielding properties have been estimated in terms of mass attenuation coefficient, half value layer and mean free path values, whereas, structural studies have been performed in terms of density, optical band gap, glass transition temperature and longitudinal ultrasonic velocity parameters. X-ray diffraction, UV-visible, DSC and ultrasonic techniques have been used to explore the structural properties of PbO-SiO2-Al2O3 and Bi2O3-SiO2-Al2O3 glass systems.

  4. Study of the gas inclusions in Al 2O 3/Y 3Al 5O 12 and Al 2O 3/Y 3Al 5O 12/ZrO 2 eutectic fibers grown by laser floating zone

    NASA Astrophysics Data System (ADS)

    Oliete, Patricia B.; Peña, José I.

    2007-06-01

    Gas bubbles appear in some metal oxides grown by directional solidification in air when high growth rates are used. The incorporation of bubbles in Al 2O 3-YAG (AY) and Al 2O 3-YAG-ZrO 2 (AYZ) eutectic crystals grown using the laser floating zone method was investigated. The effect of different growth experimental parameters was considered. Growth rate, rod diameter and growth atmosphere were found to be determinant in order to reduce the gas inclusions. The optimization of the growth parameters allowed to grow AY and AYZ eutectic crystals free of bubbles at very high growth rates at which interphase spacings smaller than 300 nm were obtained.

  5. Two-Step Electron Beam Excitation of Al2O3:Cr by Gallium Nitride Recombination Radiation

    NASA Astrophysics Data System (ADS)

    Zehe, A.; Ramírez, A.; Seifert, W.

    We report on a two-step excitation process of a GaN/A2O3:Cr specimen by an external electron beam of 30 keV. The epitaxial growth of GaN on the (0001) faces of ruby is described, as well as the experimental technique applied in the excitation and recording of the combined luminescence spectrum. It is known that the spinel and ruby are frequently used as substrate materials for the epitaxial deposition of GaN. At the same time is ruby one of the most useful layer materials with a red emission line λ = 694 nm. Due to its dielectric character, the pumping of ruby is performed usually subjecting it to the light of an intense flash lamp. Electron beam excitation, on the other hand, which could be more powerful, is impaired with electrical insulator material. This discrepancy can be removed by a two-step excitation, where at first the semiconducting GaN-layer, epitaxially grown on a (0001)Al2O3:Cr (ruby) crystal is excited to radiation emission by an external electron beam. The following internal absolption process, by the ruby crystal, of the GaN luminescence radiation provides for the characteristic 2E to 4A2-transition at 1.786 eV. We found a strong and sharp emission line of that photon energy, which additionally displays polarization, typical for the anisotropic uniaxial ruby crystal. Such an indirect electron-beam excitation of ruby allows to generate almost monochromatic red light, and might point into a direction of interesting practical applications.

  6. Reaction paths in the system Al 2O 3-hBN-Y

    NASA Astrophysics Data System (ADS)

    Reichert, K.; Oreshina, O.; Cremer, R.; Neuschütz, D.

    2001-07-01

    As part of the investigations on the suitability of a new concept for a tailored fiber-matrix interface in sapphire fiber reinforced NiAl matrix composites for application as a high-temperature structural material, the interfacial reactions in the system alumina-hexagonal boron nitride-yttrium (Al 2O 3-hBN-Y) have been examined in the temperature range of 1100-1300°C. For this, alumina substrates were coated with hBN by means of CVD and subsequently with sputter deposited yttrium. Afterwards the samples were annealed for up to 16 h under inert atmosphere. Grazing incidence X-ray diffraction (GIXRD) served to analyze the phases formed by diffusion processes in the reaction zone. The peak intensities in these diffraction patterns were used to evaluate the sequence of phases formed due to diffusion and reaction. After the initial formation of YN and YB 2, the phases Y 2O 3, Al 2Y, and YB 4 were observed. Even longer annealing times or higher temperatures, respectively, led to the formation of the ternary oxides YAlO 3 and Y 3Al 5O 12 as well as metallic aluminum.

  7. Numerical investigation of Al2O3/water nanofluid laminar convective heat transfer through triangular ducts

    PubMed Central

    2011-01-01

    In this article, laminar flow-forced convective heat transfer of Al2O3/water nanofluid in a triangular duct under constant wall temperature condition is investigated numerically. In this investigation, the effects of parameters, such as nanoparticles diameter, concentration, and Reynolds number on the enhancement of nanofluids heat transfer is studied. Besides, the comparison between nanofluid and pure fluid heat transfer is achieved in this article. Sometimes, because of pressure drop limitations, the need for non-circular ducts arises in many heat transfer applications. The low heat transfer rate of non-circular ducts is one the limitations of these systems, and utilization of nanofluid instead of pure fluid because of its potential to increase heat transfer of system can compensate this problem. In this article, for considering the presence of nanoparticl: es, the dispersion model is used. Numerical results represent an enhancement of heat transfer of fluid associated with changing to the suspension of nanometer-sized particles in the triangular duct. The results of the present model indicate that the nanofluid Nusselt number increases with increasing concentration of nanoparticles and decreasing diameter. Also, the enhancement of the fluid heat transfer becomes better at high Re in laminar flow with the addition of nanoparticles. PMID:21711694

  8. Interface considerations in Al2O3/NiAl composite

    NASA Technical Reports Server (NTRS)

    Misra, Ajay K.

    1993-01-01

    The fiber-matrix interface requirements in an Al2O3/NiAl composite were examined from theoretical considerations. Several factors that influence the interface bonding requirements were analyzed. These include: (1) residual stresses due to fiber-matrix coefficient of thermal expansion (CTE) mismatch; (2) matrix cracking stress at room temperature; (3) fracture toughness at room temperature; (4) load transfer from the matrix to the fiber and ultimate tensile strength at the use temperature; and (5) creep resistance at high temperature. A relatively weak fiber-matrix bond, with an interfacial shear strength of approximately 15-20 MPa, might be sufficient for attaining the desired mechanical properties in the fiber direction at the use temperature. A weak fiber-matrix bond is also beneficial for increasing the fracture toughness of the composite at room temperature. In contrast, a strong fiber-matrix bond is required to withstand some of the residual stresses resulting from the fiber-matrix CTE mismatch, which are not likely to be reduced significantly by interface coatings. A relatively strong bond is also beneficial in increasing the matrix cracking stress at room temperature. Various interface coating options to accommodate the conflicting bonding requirements were reviewed. One viable coating option is to incorporate a thick, ductile interface layer well bonded to both the fiber and the matrix.

  9. Residual Stress in Brazing of Submicron Al2O3 to WC-Co

    NASA Astrophysics Data System (ADS)

    Grunder, T.; Piquerez, A.; Bach, M.; Mille, P.

    2016-07-01

    This study evaluated the residual stresses induced by brazing and grinding submicron Al2O3, using different methods. Energy dispersive x-ray spectrometry analysis (EDX) of 72Ag-Cu filler and filler/WC-Co interface showed evidence of atomic diffusion and possible formation of titanium oxide layers between the joint and the bonding materials. An analytical model supported by the finite element method (FEM) based on strain determination due to the difference in variation of thermal expansion was used to assess the stress distribution at the coupling interface and in bulk materials. The model took into account the evolution of the Young's modulus and of the thermal expansion with temperature. The model could be used to follow strain and stress evolutions of the bonded materials during the cooling cycle. The maximum stress rose above -300 MPa at the center of the 100 × 100 × 3 mm ceramic plates. The residual stresses on the external surface of ceramic were investigated by x-ray diffraction (XRD) and indentation fracture method (IFM). After brazing and grinding the plate, the principal stresses were 128.1 and 94.9 MPa, and the shear stress was -20.1 MPa. Microscopic examination revealed grain pull-out promoted by the global residual stresses induced by the brazing and grinding processes. The surface stresses evaluated by the different methods were reasonably correlated.

  10. Thermal conductivity and viscosity measurements of ethylene glycol-based Al2O3 nanofluids

    PubMed Central

    2011-01-01

    The dispersion and stability of nanofluids obtained by dispersing Al2O3 nanoparticles in ethylene glycol have been analyzed at several concentrations up to 25% in mass fraction. The thermal conductivity and viscosity were experimentally determined at temperatures ranging from 283.15 K to 323.15 K using an apparatus based on the hot-wire method and a rotational viscometer, respectively. It has been found that both thermal conductivity and viscosity increase with the concentration of nanoparticles, whereas when the temperature increases the viscosity diminishes and the thermal conductivity rises. Measured enhancements on thermal conductivity (up to 19%) compare well with literature values when available. New viscosity experimental data yield values more than twice larger than the base fluid. The influence of particle size on viscosity has been also studied, finding large differences that must be taken into account for any practical application. These experimental results were compared with some theoretical models, as those of Maxwell-Hamilton and Crosser for thermal conductivity and Krieger and Dougherty for viscosity. PMID:21711737

  11. Enhanced TC in granular and thin film Al-Al2O3 nanostructures

    NASA Astrophysics Data System (ADS)

    Higgins, J. S.; Greene, R. L.

    It is known since the 1970s that the superconducting transition temperature of granular aluminum films can be as high as two to three times the transition temperature of bulk aluminum, depending on the grain size and how strongly the nanometer size grains are connected1,2. As the strength of the grain connectivity becomes increasingly weak, the enhanced TC is suppressed. The mechanism behind this enhancement is still under debate. Recently, work on larger aluminum nanoparticles (18nm) embedded in an insulating Al2O3 matrix showed an onset of the superconducting transition as high as three times that of bulk aluminum3. In this situation, the Al grains are electrically disconnected and in a regime far removed from that of the granular films. Here we compare the two situations through electronic and thermal measurements in order to help elucidate the mechanism behind the enhancements. 1S. Pracht, et al., arXiv:1508.04270v1 [cond-mat.supr-con] (2015). 2G. Deutscher, New Superconductors From Granular to High TC, New Jersey: World Scientific, 2006, p. 72-74. 3V. N. Smolyaninova, et al., Sci. Rep. 5, 15777 (2015). Funding by NSF DMR # 1410665.

  12. Surface reactions of dimethyl ether on γ-Al2O3

    NASA Astrophysics Data System (ADS)

    Bondarenko, G. N.; Volnina, E. A.; Kipnis, M. A.; Rodionov, A. S.; Samokhin, P. V.; Lin, G. I.

    2016-02-01

    The surface reactions of dimethyl ether (DME) on industrial alumina (γ-Al2O3) were studied by chromatographic analysis of the products at the outlet of the flow reactor and (independently) by diffuse reflectance IR spectroscopy. The major products of the reactions at 250°C were found to be methanol formed in the reaction of DME with hydroxyl groups (the 3720 and 3674 cm-1 bands in the diffuse reflectance spectrum) and various methoxy groups (the 1121, 1070, 695, and 670 cm-1 bands in the differential spectra). The presence of molecularly adsorbed methanol was confirmed by experiments with methanol fed in a high-temperature IR cell. The interaction of the resulting methanol molecule with the hydroxyl group led to the formation of a water molecule in the gas phase and a methoxy group on the oxide surface. Strong adsorption of molecular DME was revealed, which was favored by an increase in the temperature of the preliminary calcination of oxide from 250 to 450-500°C; treatment of alumina with water vapor after its preliminary contact with DME led to a recovery of the hydroxyl coating and a replacement of molecularly adsorbed DME with hydroxyl. The thermal effect recorded in a flow reactor was positive during the adsorption of DME and negative during the desorption of weakly bonded DME. Schemes of formation of methoxy groups in the interaction of DME and methanol with surface hydroxyls were suggested.

  13. Ferromagnetic resonance experiments in an obliquely deposited FeCo-Al2O3 film system

    NASA Astrophysics Data System (ADS)

    Lesnik, N. A.; Oates, C. J.; Smith, G. M.; Riedi, P. C.; Kakazei, G. N.; Kravets, A. F.; Wigen, P. E.

    2003-11-01

    Granular cermet films (Fe50Co50)x-(Al2O3)1-x fabricated using the electron-beam coevaporation technique at oblique incidence of FeCo and alumina atom fluxes have been found to exhibit both oblique and in-plane uniaxial magnetic anisotropy. This anisotropy first appears just below the percolation threshold due to a magnetic coupling of particles taking place at a certain stage of their growth and coalescence. The FeCo content x varied from 0.07 to 0.49. A simple model of the film microstructure is presented based on the results of magnetization measurements and ferromagnetic resonance at intermediate (9.4 GHz) and high (94 GHz) frequencies. At 94 GHz the concentration dependence of the effective anisotropy field follows the solid solution law, since then the magnetic field is sufficient to magnetize the films close to saturation. The 9.4 GHz data points deviate from the solid solution line below the percolation threshold due to both modification of the resonance fields by intergranular interactions in nonsaturated films and the reduction of the average magnetization of granules, comparing to the saturation magnetization, at room temperature. Different mechanisms of line broadening observed at frequencies used in experiments are also discussed.

  14. Residual Stress in Brazing of Submicron Al2O3 to WC-Co

    NASA Astrophysics Data System (ADS)

    Grunder, T.; Piquerez, A.; Bach, M.; Mille, P.

    2016-06-01

    This study evaluated the residual stresses induced by brazing and grinding submicron Al2O3, using different methods. Energy dispersive x-ray spectrometry analysis (EDX) of 72Ag-Cu filler and filler/WC-Co interface showed evidence of atomic diffusion and possible formation of titanium oxide layers between the joint and the bonding materials. An analytical model supported by the finite element method (FEM) based on strain determination due to the difference in variation of thermal expansion was used to assess the stress distribution at the coupling interface and in bulk materials. The model took into account the evolution of the Young's modulus and of the thermal expansion with temperature. The model could be used to follow strain and stress evolutions of the bonded materials during the cooling cycle. The maximum stress rose above -300 MPa at the center of the 100 × 100 × 3 mm ceramic plates. The residual stresses on the external surface of ceramic were investigated by x-ray diffraction (XRD) and indentation fracture method (IFM). After brazing and grinding the plate, the principal stresses were 128.1 and 94.9 MPa, and the shear stress was -20.1 MPa. Microscopic examination revealed grain pull-out promoted by the global residual stresses induced by the brazing and grinding processes. The surface stresses evaluated by the different methods were reasonably correlated.

  15. ENERGY CONVERSION FOR THE TRANSITION FROM Al TO γ-Al2O3 NANOPARTICLES

    NASA Astrophysics Data System (ADS)

    Wang, Shulin; Li, Shengjuan; Xu, Bo; Jian, Dunliang; Zhu, Yufang

    2013-07-01

    We have successfully converted large volume Al particles into γ-Al2O3 nanostructures by vibration milling at room temperature and successive treatment. We show that there exist special relationships among stacking fault energy (SFE), strain energy (SRE), and surface energy (SE) of the materials, including interdependence, intercompetition, and interconversion during the phase transition. SFE and SRE perform the same changing tendency, while SE just does the opposite. However, it is not the particle size but the energy state that determines the reactivity of the materials. And it is the SE that can directly determine the physical chemical reaction and the conversion into the end product rather than SFE and SRE. When SE goes up, the material reactivity and the product yield will be enhanced; and when SE goes down, the reaction and the product yield will decay. However, the state of SE depends closely on the change tendency of the SFE and SRE. That is, when SFE and SRE goes up, SE will goes down; if SFE and SRE goes down, SE will goes up. It seems that energy conservation law may be followed in a sense in the particle system if the external input keeps constant. The work may be significant for energy conversion in nano-scale and mechanosynthesis of oxide nanoparticles.

  16. Effect of ozone concentration on silicon surface passivation by atomic layer deposited Al2O3

    NASA Astrophysics Data System (ADS)

    von Gastrow, Guillaume; Li, Shuo; Putkonen, Matti; Laitinen, Mikko; Sajavaara, Timo; Savin, Hele

    2015-12-01

    We study the impact of ozone-based Al2O3 Atomic Layer Deposition (ALD) on the surface passivation quality of crystalline silicon. We show that the passivation quality strongly depends on the ozone concentration: the higher ozone concentration results in lower interface defect density and thereby improved passivation. In contrast to previous studies, our results reveal that too high interface hydrogen content can be detrimental to the passivation. The interface hydrogen concentration can be optimized by the ozone-based process; however, the use of pure ozone increases the harmful carbon concentration in the film. Here we demonstrate that low carbon and optimal hydrogen concentration can be achieved by a single process combining the water- and ozone-based reactions. This process results in an interface defect density of 2 × 1011 eV-1 cm-2, and maximum surface recombination velocities of 7.1 cm/s and 10 cm/s, after annealing and after an additional firing at 800 °C, respectively. In addition, our results suggest that the effective oxide charge density can be optimized in a simple way by varying the ozone concentration and by injecting water to the ozone process.

  17. Mixed Matrix Carbon Molecular Sieve and Alumina (CMS-Al2O3) Membranes

    PubMed Central

    Song, Yingjun; Wang, David K.; Birkett, Greg; Martens, Wayde; Duke, Mikel C.; Smart, Simon; Diniz da Costa, João C.

    2016-01-01

    This work shows mixed matrix inorganic membranes prepared by the vacuum-assisted impregnation method, where phenolic resin precursors filled the pore of α-alumina substrates. Upon carbonisation, the phenolic resin decomposed into several fragments derived from the backbone of the resin matrix. The final stages of decomposition (>650 °C) led to a formation of carbon molecular sieve (CMS) structures, reaching the lowest average pore sizes of ~5 Å at carbonisation temperatures of 700 °C. The combination of vacuum-assisted impregnation and carbonisation led to the formation of mixed matrix of CMS and α-alumina particles (CMS-Al2O3) in a single membrane. These membranes were tested for pervaporative desalination and gave very high water fluxes of up to 25 kg m−2 h−1 for seawater (NaCl 3.5 wt%) at 75 °C. Salt rejection was also very high varying between 93–99% depending on temperature and feed salt concentration. Interestingly, the water fluxes remained almost constant and were not affected as feed salt concentration increased from 0.3, 1 and 3.5 wt%. PMID:27469389

  18. Characterization of Al2O3 Supported Nickel Catalysts Derived from RFNon-thermal Plasma Technology

    SciTech Connect

    Jang, Ben W; Helleson, Michael J; Shi, Chunkai; Rondinone, Adam Justin; Schwartz, Viviane; Liang, Chengdu; Overbury, Steven {Steve} H

    2008-01-01

    Catalysts derived from non-thermal plasma techniques have previously shown unusual and highly advantageous catalytic properties including room temperature reduction, unusual metal particle structure and metal-support interactions, and enhanced selectivity and stability. This study focuses on the characterization of Al2O3 supported Ni catalysts derived from the RF non-thermal plasma technique with in-situ XRD, TPR-MS and STEM and on relating the results to the enhanced activity and stability of benzene hydrogenation. The results suggest that catalysts with plasma treatments before impregnation are relatively easier to be reduced and result in better activities under mild reduction conditions. These plasma treatments stabilize the nickel particle sizes of air(B) and H2(B) catalysts at 600 C by slowing down the sintering process. Plasma treatments after the impregnation of precursors, on the other hand, tend to delay the growth of nickel particles below 600 C, forming smaller Ni particles, but with a sudden increase in particle size near 600 C. It suggests that the structure of Ni nitrate and the metal-support interaction have been altered by the plasma treatments. The reduction patterns of plasma 1 treated catalysts are, therefore, changed. The catalyst with a combination plasma treatment demonstrates that the effect of a combination plasma treatment is larger than either the plasma treatment before or after the impregnation alone. Both plasma treatments before and after the impregnation of metal precursor play important roles in modifying supported metal catalysts.

  19. The Influence of impact on Composite Armour System Kevlar-29/polyester-Al2O3

    NASA Astrophysics Data System (ADS)

    Ramadhan, A. A.; Abu Talib, A. R.; Mohd Rafie, A. S.; Zahari, R.

    2012-09-01

    An experimental investigation of high velocity impact responses of composite laminated plates using a helium gas gun has been presented in this paper. The aim of this study was to develop the novel composite structure that meets the specific requirements of ballistic resistance which used for body protections, vehicles and other applications. Thus the high velocity impact tests were performed on composite Kevlar-29 fiber/polyester resin with alumina powder (Al2O3). The impact test was conducted by using a cylindrical steel projectile of 7.62mm diameter at a velocity range of 160-400 m/s. The results (shown in this work) are in terms of varying plate thickness and the amount of energy absorbed by the laminated plates meanwhile we obtained that the 12mm thickness of composite plate suitable for impact loading up to 200m/s impact velocity. Therefore this composite structure (it is used to reduce the amount of Kevlar) considered most economical armoure products. We used the ANSYS AUTODYN 3D- v.12 software for our simulations. The results have been obtained a4.1% maximum errors with experimental work of energy absorption.

  20. Dynamic Friction Performance of a Pneumatic Cylinder with Al2O3 Film on Cylinder Surface.

    PubMed

    Chang, Ho; Lan, Chou-Wei; Wang, Hao-Xian

    2015-11-01

    A friction force system is proposed for accurately measuring friction force and motion properties produced by reciprocating motion of piston in a pneumatic cylinder. In this study, the proposed system is used to measure the effects of lubricating greases of different viscosities on the friction properties of pneumatic cylinder, and improvement of stick-slip motion for the cylinder bore by anodizing processes. A servo motor-driven ball screw is used to drive the pneumatic cylinder to be tested and to measure the change in friction force of the pneumatic cylinder. Experimental results show, that under similar test conditions, the lubricating grease with viscosity VG100 is best suited for measuring reciprocating motion of the piston of pneumatic cylinder. The wear experiment showed that, in the Al2O3 film obtained at a preset voltage 40 V in the anodic process, the friction coefficient and hardness decreased by 55% and increased by 274% respectively, thus achieving a good tribology and wear resistance. Additionally, the amplitude variation in the friction force of the pneumatic cylinder wall that received the anodizing treatment was substantially reduced. Additionally, the stick-slip motion of the pneumatic cylinder during low-speed motion was substantially improved. PMID:26726680

  1. Athermal fading of luminescence in Al2 O3 ceramic substrates

    NASA Astrophysics Data System (ADS)

    Terry, Ian; Kouroukla, Eftychia; Bailiff, Ian K.

    2015-03-01

    Retrospective dosimetry aims to reconstruct ionising radiation dose to populations following a radiological incident using materials not designed for that purpose. Sintered alumina ceramic can function as a dosimeter with its luminescence properties and related trapped charge storage mechanism. Its widespread use as a substrate in surface mount devices and incorporation in devices such as mobile phones make it a ubiquitous potential dosimeter. We investigated the optically (OSL) and thermally (TL) stimulated luminescence properties of sintered alumina substrates. In contrast to their single crystal analogue developed for personal dosimetry, Al2O3:C, the substrates exhibit a significant loss of trapped charge (fading) within hours following irradiation at RT that seriously limits their utility for dosimetry over an extended timescale. The fading rates of OSL and TL signals of 0402 resistors were analysed under various storage conditions (time and temperature), complemented by a study of their microstructure. The results support a model of athermal loss of trapped charge due to electron tunnelling from trapping states; this contrasting behaviour is attributed to a physical modification of the trap environment arising from the manufacturing process.

  2. Mixed Matrix Carbon Molecular Sieve and Alumina (CMS-Al2O3) Membranes.

    PubMed

    Song, Yingjun; Wang, David K; Birkett, Greg; Martens, Wayde; Duke, Mikel C; Smart, Simon; Diniz da Costa, João C

    2016-01-01

    This work shows mixed matrix inorganic membranes prepared by the vacuum-assisted impregnation method, where phenolic resin precursors filled the pore of α-alumina substrates. Upon carbonisation, the phenolic resin decomposed into several fragments derived from the backbone of the resin matrix. The final stages of decomposition (>650 °C) led to a formation of carbon molecular sieve (CMS) structures, reaching the lowest average pore sizes of ~5 Å at carbonisation temperatures of 700 °C. The combination of vacuum-assisted impregnation and carbonisation led to the formation of mixed matrix of CMS and α-alumina particles (CMS-Al2O3) in a single membrane. These membranes were tested for pervaporative desalination and gave very high water fluxes of up to 25 kg m(-2) h(-1) for seawater (NaCl 3.5 wt%) at 75 °C. Salt rejection was also very high varying between 93-99% depending on temperature and feed salt concentration. Interestingly, the water fluxes remained almost constant and were not affected as feed salt concentration increased from 0.3, 1 and 3.5 wt%. PMID:27469389

  3. Development of lasers optimized for pumping Ti:Al2O3 lasers

    NASA Technical Reports Server (NTRS)

    Rines, Glen A.; Schwarz, Richard A.

    1994-01-01

    Laboratory demonstrations that were completed included: (1) an all-solid-state, broadly tunable, single-frequency, Ti:Al2O3 master oscillator, and (2) a technique for obtaining 'long' (nominally 100- to 200-ns FWHM) laser pulses from a Q-switched, Nd oscillator at energy levels commensurate with straightforward amplification to the joule level. A diode-laser-pumped, Nd:YLF laser with intracavity SHG was designed, constructed, and evaluated. With this laser greater than 0.9 W of CW, output power at 523.5 nm with 10 W of diode-laser pump power delivered to the Nd:YLF crystal was obtained. With this laser as a pump source, for the first time, to our knowledge, an all solid-state, single frequency, Ti:Al203 laser with sufficient output power to injection seed a high-energy oscillator over a 20-nm bandwidth was demonstrated. The pulsed laser work succeeded in demonstrating pulse-stretching in a Q-switched Nd:YAG oscillator. Pulse energies greater than 50-mJ were obtained in pulses with 100- to 200-ns pulsewidths (FWHM).

  4. Wet foams hydrophobized by amphiphiles to give Al2O3 porous ceramics

    NASA Astrophysics Data System (ADS)

    Pokhrel, Ashish; Park, Jung Gyu; Kim, Ik Jin

    2012-05-01

    Wet chemical method to prepare ceramic foams with antecedent stability using inorganic particles (Al2O3,SiO2 etc.) which are in situ hydrophobized upon adsorption of short-chain amphiphilic molecules in the wet state and heightened mechanical property in the sintered state was developed. These wet foams are stable over several days and show no bubble coarsening nor drainage or creaming. This long-term stability is achieved through the irreversible adsorption of partially hydrophobized colloidal particles to the air-water interface using short-chain amphiphiles to in situ modify the wetting behavior of the particle surface based on the observations of Pickering emulsions. As a result, the suspension is foamed homogeneously throughout its entire volume and porous bulk materials can be produced upon drying and sintering. Wet foams featuring average bubble sizes between 30 and 300μm and sintered foams with porosity from 50 to 85% were obtained by adjusting the amphiphile - particle concentration, and additives in the initial suspension. Cells were mostly closed with an average size of approximately 150 μm. Single cells were separated by walls with minimum thicknesses of 1-3 μm.

  5. Porous Alumina Template by Selective Dissolution of Ni from Sintered Al2O3-Ni Composite

    NASA Astrophysics Data System (ADS)

    Jain, M.; Moon, A. P.; Mondal, K.

    2015-07-01

    In the present study, porous alumina template was fabricated by selective dissolution of Ni from the pressureless sintered Al2O3-Ni. Alumina and Ni powders of 99.9% purity were subjected to ball milling (200 rpm, 1 h, 10:1 ball-to-powder weight ratio) in order to get homogeneous mechanical mixture. The milled powder was compacted using hydraulic press under the uniaxial pressure of 400 MPa for 1 min, and the pressureless sintering was carried out in reducing atmosphere (H2) at 1400 °C. Ni was then selectively and completely dissolved from the 1-mm-thick sintered disk of diameter 16 mm in 1 M HCl + 3 wt.% FeCl3 solution to get the porous template of alumina. The porous alumina template was found to have sufficient compressive strength. BET, x-ray diffraction, optical microscopy, and scanning electron microscopy studies along with energy dispersive spectroscopy were performed to study microstructural evolutions, bonding characteristics, and distributions of Ni before and after the dissolution of the sintered composite.

  6. Transferable model for the atomistic simulation of Al2O3

    NASA Astrophysics Data System (ADS)

    Wilson, Mark; Exner, Martin; Huang, Yin-Min; Finnis, Michael W.

    1996-12-01

    We calculate the energies of different solid phases of Al2O3 using a shell model, a compressible ion model, and a compressible ion model which includes both dipole and quadrupolar polarizability of the O2- ions. Compressible oxygen ions are found to stabilize the corundum structure with respect to the θ form of alumina. The observed corundum structure is nevertheless unstable with respect to the bixbyite structure until quadrupolar polarizability of the oxygen is also included. Entropy differences are estimated with a lattice dynamics calculation and are found to make an insignificant contribution to stabilizing the corundum. We also calculate the relative energies of the corundum and bixbyite structures using the ab initio pseudopotential method, within the local-density approximation for exchange and correlation. The resulting self-consistent electron density shows graphically how the quadrupolar distortions around the oxygen develop as the basis is made more complete (the plane-wave cutoff is increased from 500 to 700 eV), which at the same time brings the energy of the corundum structure below that of the bixbyite structure.

  7. Fatigue strength of Ce-TZP/Al2O3 nanocomposite with different surfaces.

    PubMed

    Takano, T; Tasaka, A; Yoshinari, M; Sakurai, K

    2012-08-01

    Ce-TZP/Al(2)O(3) nanocomposite (NANOZR) has not only higher strength, but also higher fracture toughness than conventional Y-TZP, indicating its potential for use in dental implants. Surface treatment to obtain osseointegration, however, may alter its surface topography, thus affecting the cyclic fatigue strength that plays such an important role in the durability of this material. The aim of this study was to evaluate the influence of surface treatment on cyclic fatigue strength in NANOZR as compared with grit-blasted and acid-etched Y-TZP (125BE Y-TZP). Bi-axial flexure strength was measured in both static and cyclic fatigue tests, as recommended by ISO 6872. The cyclic fatigue test was performed by the staircase method in distilled water at 37°C, with a load of 10(6) cycles and 10 Hz. Bi-axial flexure strength of NANOZR was 1111-1237 MPa and 667-881 MPa in the static and cyclic fatigue tests, respectively. The bi-axial flexure strength of NANOZR under all conditions was greater than that of 125BE Y-TZP in the static and cyclic fatigue tests. The cyclic fatigue strength of NANOZR was more than twice that of Y-TZP as specified in ISO 13356 for surgical implants (320 MPa), indicating the promise of this material for use in dental implants. PMID:22736446

  8. Mixed Matrix Carbon Molecular Sieve and Alumina (CMS-Al2O3) Membranes

    NASA Astrophysics Data System (ADS)

    Song, Yingjun; Wang, David K.; Birkett, Greg; Martens, Wayde; Duke, Mikel C.; Smart, Simon; Diniz da Costa, João C.

    2016-07-01

    This work shows mixed matrix inorganic membranes prepared by the vacuum-assisted impregnation method, where phenolic resin precursors filled the pore of α-alumina substrates. Upon carbonisation, the phenolic resin decomposed into several fragments derived from the backbone of the resin matrix. The final stages of decomposition (>650 °C) led to a formation of carbon molecular sieve (CMS) structures, reaching the lowest average pore sizes of ~5 Å at carbonisation temperatures of 700 °C. The combination of vacuum-assisted impregnation and carbonisation led to the formation of mixed matrix of CMS and α-alumina particles (CMS-Al2O3) in a single membrane. These membranes were tested for pervaporative desalination and gave very high water fluxes of up to 25 kg m‑2 h‑1 for seawater (NaCl 3.5 wt%) at 75 °C. Salt rejection was also very high varying between 93–99% depending on temperature and feed salt concentration. Interestingly, the water fluxes remained almost constant and were not affected as feed salt concentration increased from 0.3, 1 and 3.5 wt%.

  9. Molten Al and (0001) α-Al2O3 Single Crystal: Interface Stability

    NASA Astrophysics Data System (ADS)

    Aguilar-santillan, Joaquin

    2016-08-01

    The roughness on the "c"-plane (0001) sapphire single crystal reduces wetting of molten aluminum under Ar gas (99.999 pct) and PO2 10-15 Pa from 1073 K to 1473 K (800 °C to 1200 °C). The contact angle effect was partially understood by the roughness factor, R; however, the interfacial phenomenon involving this effect is yet a topic to study as it also depends, between other things, on the shape of droplet and the relationship to its substrate. The theory explains that the surface tension of liquid aluminum obtained by the sessile drop test can be determined just when a substrate is polished or free of any surface imperfection. However, roughness of sapphire (0001) surface promotes an apparent surface tension that exhibits different trends of wetting to that proposed in previous studies. This property adds to the interfacial wetting phenomena obtained from the Al-Al2O3 couple system and provides answers for contact angle trends toward a much more stable interface, which when coupled with thermodynamic conditions may help in the manufacturing, deterioration, and reliability of the system.

  10. New battery strategies with a polymer/Al2O3 separator

    NASA Astrophysics Data System (ADS)

    Park, Kyusung; Cho, Joon Hee; Shanmuganathan, Kadhiravan; Song, Jie; Peng, Jing; Gobet, Mallory; Greenbaum, Steven; Ellison, Christopher J.; Goodenough, John B.

    2014-10-01

    A low-cost, thin, flexible, and mechanically robust alkali-ion electrolyte separator is shown to allow fabrication of a safe rechargeable alkali-ion battery with alternative cathode strategies. A Na-ion battery with an insertion host as cathode and a Li-ion battery with a redox flow-through cathode are demonstrated to cycle without significant fade. The separator membrane is a composite of Al2O3 particles and cross-linked ethylene-oxide chains; it can be fabricated at low cost into a large-area thin membrane that blocks dendrites from an alkali-metal anode. To block a soluble ferrocene redox molecule from crossing from the cathode side to the anode in a Li-ion battery with a redox-flow cathode, a thin mixed Li+/electronic-conducting film has been added to the cathode side of the composite separator. An osmosis issue was minimized by balancing concentrations of solutes on the two sides of the separator where the cathode side contains a soluble redox molecule.

  11. Thermoelectric Powers of Cells With NaF-AlF3-Al2O3 Melts

    NASA Astrophysics Data System (ADS)

    Flem, Belinda E.; Xu, Qian; Kjelstrup, Signe; Sterten, Åsmund

    2001-07-01

    A thermodynamic description of the Peltier heat at the aluminum and the oxygen electrode in the system NaF-AlF3-Al2O3 is given. The thermoelectric power in melts with molar ratios n NaF/n AlF3 from 3.0 to 1.0, saturated with alumina are measured. Seebeck coefficients for molten fluoride electrolytes saturated with alumina, electrolytes that are relevant for aluminum electrowinning electrolysis cells, are reported. The results allow determinations of Peltier heats of aluminum, oxygen and carbon electrodes in NaF-AlF3 electrolytes saturated with alumina. For molar ratios of n NaF/n AlF3 between 2.6 and 1.2, there is a Peltier heating of the aluminum cathode. This heating is in the same order of magnitude as the electrolyte Joule heat, when the current density is 0.7 A cm-2. For molar ratio n NaF/n AlF3 equal to 1.0 the Peltier effect at the aluminum electrode approaches zero. From theoretical considerations we expect a drop also for molar ratio 3.0. For the anode we report a Peltier cooling that is larger than the heat produced by the anodic overvoltage, in melts with NaF/AlF3 molar ratio between 2.6 and 1.2 saturated with alumina.

  12. Morphology Control for Al2O3 Inclusion Without Ca Treatment in High-Aluminum Steel

    NASA Astrophysics Data System (ADS)

    He, Shengping; Chen, Gujun; Guo, Yintao; Shen, Boyi; Wang, Qian

    2015-04-01

    Nozzle blockage is a major problem during continuous casting of Al-containing steel. Herein, we analyzed the thermodynamic equilibrium behavior between aluminum and oxygen in steel at 1873 K (1600 °C) and demonstrated that, the dissolved [O] initially decreases with increasing the dissolved [Al] until approximately 0.1 wt pct [Al], and after that, the dissolved [O] increases with dissolved [Al]. Thus, for high-aluminum steel with 1.0 wt pct dissolved [Al], the precipitation of Al2O3 inclusion can be avoided during cooling from deoxidation temperature to the liquidus temperature, if the actual dissolved [O] can be kept from increasing when the dissolved [Al] further increases from 0.1 to 1.0 wt pct. Hence, a method of inclusion control for high-aluminum steel without traditional Ca treatment technology was proposed based on the thermodynamic analysis. Industrial tests confirmed that low-melting point Ca-aluminate inclusions were observed typically through a slag washing with SiO2-minimized high-basicity slag during tapping, accompanied by two-step Al-adding process for production of high-aluminum steel. Moreover, there was no nozzle clogging occurred for five heats of continuous casting.

  13. Combustion synthesis of ceramic-metal composite materials - The TiC-Al2O3-Al system

    NASA Technical Reports Server (NTRS)

    Feng, H. J.; Moore, John J.; Wirth, D. G.

    1992-01-01

    Combustion synthesis was applied for producing ceramic-metal composites with reduced levels of porosity, by allowing an excess amount of liquid metal, generated by the exothermic reaction during synthesis, to infiltrate the pores. It is shown that this method, when applied to TiC-Al2O3 system, led to a decreased level of porosity in the resulting TiC-Al2O3-Al product, as compared with that of TiC-Al2O3 system. This in situ procedure is more efficient than the two-stage conventional processes (i.e., sintering followed by liquid metal infiltration), although there are limitations with respect to total penetration of the liquid metal and maintaining a stable propagation of the combustion reaction.

  14. A study of the effect of Al2O3 reflector on response function of NaI(Tl) detector

    NASA Astrophysics Data System (ADS)

    Tam, Hoang Duc; Chuong, Huynh Dinh; Thanh, Tran Thien; Van Tao, Chau

    2016-08-01

    This study aims to assess the effect of Al2O3 reflector surrounding the NaI(Tl) crystal on the detector response function, based on Monte Carlo simulation, which can verify the precise model of the NaI(Tl) detector. The method used in determining the suitable thickness of Al2O3 reflector is to compare the calculated and experimental values of full-energy peak efficiency. The results show that the Al2O3 reflector should have a thickness of 0.8-1.2 mm for the maximum deviation between the experimental and simulated efficiency of 3.2% at all concerning energies. In addition, the obtained results are in good agreement with the response function of simulation and experimental spectra.

  15. Modulation in current density of metal/n-SiC contact by inserting Al2O3 interfacial layer

    PubMed Central

    2013-01-01

    Metal contact to SiC is not easy to modulate since the contact can be influenced by the metal, the termination of the SiC, the doping, and the fabrication process. In this work, we introduce a method by inserting a thin Al2O3 layer between metal and SiC to solve this problem simply but effectively. The Al2O3/n-SiC interface composition was obtained with X-ray photoemission spectroscopy, and the electrical properties of subsequently deposited metal contacts were characterized by current–voltage method. We can clearly demonstrate that the insertion of Al2O3 interfacial layer can modulate the current density effectively and realize the transfer between the Schottky contact and ohmic contact. PMID:23452618

  16. HfO2/Al2O3 multilayer for RRAM arrays: a technique to improve tail-bit retention.

    PubMed

    Huang, Xueyao; Wu, Huaqiang; Bin Gao; Sekar, Deepak C; Dai, Lingjun; Kellam, Mark; Bronner, Gary; Deng, Ning; Qian, He

    2016-09-30

    In this work, the HfO2/Al2O3 multilayer structure is applied for RRAM arrays. Compared to HfO2 RRAM, the data retention failure of tail bits is suppressed significantly, especially for the high resistance state (HRS). The retention of tail bits is studied in detail by temperature simulation and crystallization analysis. We attribute the improvement of tail-bit retention to the decreased oxygen ion diffusivity caused by the Al2O3 layer. Furthermore, the HfO2/Al2O3 multilayer structure exhibits higher crystallization temperature, thus leading to fewer grain boundaries around the filament during the operations. With fewer grain boundaries, oxygen ion diffusion is suppressed, leading to fewer tail bits and better retention. PMID:27537613

  17. Tensile Properties of Nano AL2O3 Particulate-Reinforced Aluminum Matrix Composites by Mechanical Alloying and Hot Extrusion

    NASA Astrophysics Data System (ADS)

    Mehdinia, M.; Jenabali Jahromi, S. A.

    The powder of the micro Al and variant volume fractions of nano Al2O3 were milled by a high energy planetary ball-mill. By milling, a homogenous distribution of nano Al2O3 particles in the metal matrix were developed. Then the milled powder was cold compressed and sintered at 545°C for one hr. The mold and the sintered sample hold in a furnace until the temperature reached 545°C. Then the hot 27mm diameter sample was extruded to 6mm diameter. From the extruded specimens, tensile, hardness and microstructure of the prepared specimens were determined. By these tests the effect of milling time, the percent of nano-particles and the microstructure were evaluated. The hardness and tensile behaviors of aluminum matrix composites reinforced with nano Al2O3 particulate have been found to increase remarkably with the volume fraction of the reinforcement.

  18. In situ atomic layer deposition half cycle study of Al2O3 growth on AlGaN

    NASA Astrophysics Data System (ADS)

    Brennan, Barry; Qin, Xiaoye; Dong, Hong; Kim, Jiyoung; Wallace, Robert M.

    2012-11-01

    The atomic layer deposition (ALD) of Al2O3 on the native oxide and hydrofluoric acid treated Al0.25Ga0.75 N surface was studied using in situ X-ray photoelectron spectroscopy (XPS), after each individual "half cycle" of the ALD process. Initially, Al2O3, Ga2O3, and N-O states were detected on both surfaces at differing concentrations. During the course of the deposition process, the N-O bonds are seen to decrease to within XPS detection limits, as well as a small decrease in the Ga2O3 concentration. The Al2O3 growth rate initially is seen to be very low, indication of low reactivity between the trimethyl-aluminum molecule and the AlGaN surface.

  19. Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

    NASA Astrophysics Data System (ADS)

    Langereis, E.; Keijmel, J.; van de Sanden, M. C. M.; Kessels, W. M. M.

    2008-06-01

    The surface groups created during plasma-assisted atomic layer deposition (ALD) of Al2O3 were studied by infrared spectroscopy. For temperatures in the range of 25-150°C, -CH3 and -OH were unveiled as dominant surface groups after the Al(CH3)3 precursor and O2 plasma half-cycles, respectively. At lower temperatures more -OH and C-related impurities were found to be incorporated in the Al2O3 film, but the impurity level could be reduced by prolonging the plasma exposure. The results demonstrate that -OH surface groups rule the surface chemistry of the Al2O3 process and likely that of plasma-assisted ALD of metal oxides from organometallic precursors in general.

  20. Al2O3 and TiO2 entrapped ABS membranes: Preparation, characterization and study of irradiation effect

    NASA Astrophysics Data System (ADS)

    Kamelian, Fariba Sadat; Mousavi, Seyed Mahmoud; Ahmadpour, Ali

    2015-12-01

    The present study focuses on the aluminum oxide (Al2O3) and titanium oxide (TiO2) entrapped acrylonitrile-butadiene-styrene (ABS) membranes prepared from phase inversion method. The effect of Al2O3 and TiO2 nanoparticles on the hydrophilicity, tensile strength, thermal stability, permeate flux, and rejection of wastewater pollution indices was investigated. Some of the membranes were exposed to ultraviolet (UV) irradiation. Al2O3 and TiO2 nanoparticles generally improved performance of the membranes. Thermal stability and tensile strength of the membranes were also enhanced in the presence of the nanoparticles. Increasing the nanoparticles concentration increased viscosity of the casting solutions. The UV irradiated membranes had better performance than the non-irradiated ones.

  1. Influence of calcination temperature on the surface area of submicron-sized Al2O3 electrospun fibers

    NASA Astrophysics Data System (ADS)

    Shin, Hyeon Ung; Ramsier, Rex D.; Chase, George G.

    2016-03-01

    Submicron-sized Al2O3 fibers were formed by calcination of electrospun aluminum acetate/PVP composite fibers. At 650 °C, the fibers were amorphous. As the calcination temperature increased to 750 °C, the fibers transitioned from amorphous to 49 % crystalline gamma phase Al2O3. The crystallinity further increased with calcination temperature to 80 % gamma Al2O3 at 950 °C, but decreased above 950 °C as the crystal structure began to change to alpha phase. The fiber diameters tended to decrease as calcination temperature increased to 950 °C but increased as the alpha phase was formed at temperatures above 950 °C. Surface areas as measured by BET decreased as gamma phase crystallinity increased. Further decrease in surface area as the gamma phase crystal structure transitioned to alpha phase indicated changing internal pore structures of the fibers.

  2. Corrosion behaviour of sintered NdFeB coated with Al/Al 2O 3 multilayers by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Mao, Shoudong; Yang, Hengxiu; Huang, Feng; Xie, Tingting; Song, Zhenlun

    2011-02-01

    Al/Al2O3 multilayers were deposited on sintered NdFeB magnets to improve the corrosion resistance. The amorphous Al2O3 films were used to periodically interrupt the columnar growth of the Al layers. The structure of the multilayers was investigated by Scanning Electron Microscopy (SEM) and High Resolution Transmission Electron Microscopy (HRTEM). It was found that the columnar structure was effectively inhibited in the multilayers. Subsequent corrosion testing by potentiodynamic polarization in 3.5 wt.% NaCl and neutral salt spray test (NSS) revealed that the Al/Al2O3 multilayers had much better corrosion resistance than the Al single layer. Furthermore, for multilayers with similar thickness, the corrosion resistance was improved as the period decreased.

  3. MnOx-CeO2-Al2O3 mixed oxides for soot oxidation: activity and thermal stability.

    PubMed

    Wu, Xiaodong; Liu, Shuang; Weng, Duan; Lin, Fan; Ran, Rui

    2011-03-15

    MnO(x)-CeO(2)-Al(2)O(3) mixed oxides were prepared by impregnating manganese acetate and cerium nitrate on alumina powders using the sol-gel method. The thermal stabilities of MnO(x)-CeO(2) and Al(2)O(3)-modified mixed oxides were evaluated by treating at 800 °C in dry air flow for 20h. The introduction of Al(2)O(3) markedly increases the textural stability of the catalyst with a relatively high dispersion of MnO(x) and CeO(2), remaining a strong synergistic effect between these two oxides. The NO oxidation activity of the ternary oxides experiences a smaller loss after high-temperature calcination, and a low soot oxidation temperature is attained in the presence of NO. PMID:21276659

  4. Porous α-Al2O3 thermal barrier coatings with dispersed Pt particles prepared by cathode plasma electrolytic deposition

    NASA Astrophysics Data System (ADS)

    Wang, Peng; He, Ye-dong; Deng, Shun-jie; Zhang, Jin

    2016-01-01

    Porous α-Al2O3 thermal barrier coatings (TBCs) containing dispersed Pt particles were prepared by cathode plasma electrolytic deposition (CPED). The influence of the Pt particles on the microstructure of the coatings and the CPED process were studied. The prepared coatings were mainly composed of α-Al2O3. The average thickness of the coatings was approximately 100 μm. Such single-layer TBCs exhibited not only excellent high-temperature cyclic oxidation and spallation resistance, but also good thermal insulation properties. Porous α-Al2O3 TBCs inhibit further oxidation of alloy substrates because of their extremely low oxygen diffusion rate, provide good thermal insulation because of their porous structure, and exhibit excellent mechanical properties because of the toughening effect of the Pt particles and because of stress relaxation induced by deformation of the porous structure.

  5. Estimation Model for Electrical Conductivity of CaF2-CaO-Al2O3 Slags

    NASA Astrophysics Data System (ADS)

    Shi, Guan-yong; Zhang, Ting-an; Dou, Zhi-he; Niu, Li-ping

    2016-04-01

    Electrical conductivity is one of the most important properties of molten slags. It has an important influence on process parameter selection of the electroslag remelting process. In the present work, a new model for estimating electrical conductivity of high-temperature slags has been proposed via calculating the conductivity by electrical conductivity of pure substances and interaction parameters between the different components in the slag has been proposed. In this model, the Arrhenius law is used to describe the relationship between electrical conductivity and temperature of slags. This model has been successfully applied to the CaF2-Al2O3, CaF2-CaO, and CaO-Al2O3, as well as CaF2-CaO-Al2O3 systems, and the calculated results are in good agreement with the measured values.

  6. Effect of calcination time on NiAl-Al2O3 using gel combustion synthesis method

    NASA Astrophysics Data System (ADS)

    Afandi, N. F.; Manap, A.; Yusof, S. N. A.; Salim, M. A.; Azim, M. Al.; Othman, S. Z.; Pauzi, N. I. M.; Omar, Nooririnah; Misran, H.

    2015-07-01

    This study was conducted in order to investigate the effect of calcination time on phase and microstructural characteristics of intermetallic matric composite (IMC), NiAl-Al2O3 powder. This powder was synthesized using gel combustion method with octyl alcohol as fuel. Upon completion of the combustion process, the loose powder was calcined at 1050°C for 1, 2 and 4 hours and characterized using XRD, FESEM and TEM. The crystallite size was calculated to be in the range of 29-30 nm. It was found that NiAl-Al2O3 exhibits high crystalline structure after calcination for 4 hours. Furthermore, longer calcination time also cause growth of the particle size. Findings indicate that high crystalline nanostructured NiAl-Al2O3 powder consisting of submicron particles can be successfully produced using gel combustion synthesis with longer calcination time.

  7. Energy-band diagram configuration of Al2O3/oxygen-terminated p-diamond metal-oxide-semiconductor

    NASA Astrophysics Data System (ADS)

    Maréchal, A.; Aoukar, M.; Vallée, C.; Rivière, C.; Eon, D.; Pernot, J.; Gheeraert, E.

    2015-10-01

    Diamond metal-oxide-semiconductor capacitors were prepared using atomic layer deposition at 250 °C of Al2O3 on oxygen-terminated boron doped (001) diamond. Their electrical properties were investigated in terms of capacitance and current versus voltage measurements. Performing X-ray photoelectron spectroscopy based on the measured core level energies and valence band maxima, the interfacial energy band diagram configuration of the Al2O3/O-diamond is established. The band diagram alignment is concluded to be of type I with valence band offset Δ E v of 1.34 ± 0.2 eV and conduction band offset Δ E c of 0.56 ± 0.2 eV considering an Al2O3 energy band gap of 7.4 eV. The agreement with electrical measurement and the ability to perform a MOS transistor are discussed.

  8. Quantum Chemical Simulation of Carbon Nanotube Nucleation on Al2O3 Catalysts via CH4 Chemical Vapor Deposition.

    PubMed

    Page, Alister J; Saha, Supriya; Li, Hai-Bei; Irle, Stephan; Morokuma, Keiji

    2015-07-29

    We present quantum chemical simulations demonstrating how single-walled carbon nanotubes (SWCNTs) form, or "nucleate", on the surface of Al2O3 nanoparticles during chemical vapor deposition (CVD) using CH4. SWCNT nucleation proceeds via the formation of extended polyyne chains that only interact with the catalyst surface at one or both ends. Consequently, SWCNT nucleation is not a surface-mediated process. We demonstrate that this unusual nucleation sequence is due to two factors. First, the π interaction between graphitic carbon and Al2O3 is extremely weak, such that graphitic carbon is expected to desorb at typical CVD temperatures. Second, hydrogen present at the catalyst surface actively passivates dangling carbon bonds, preventing a surface-mediated nucleation mechanism. The simulations reveal hydrogen's reactive chemical pathways during SWCNT nucleation and that the manner in which SWCNTs form on Al2O3 is fundamentally different from that observed using "traditional" transition metal catalysts. PMID:26148208

  9. Characterization of Al2O3-HfO2-Al2O3 sandwiched MIM capacitor under DC and AC stresses

    NASA Astrophysics Data System (ADS)

    Kwak, Ho-Young; Kwon, Hyuk-Min; Jung, Yi-Jung; Kwon, Sung-Kyu; Jang, Jae-Hyung; Choi, Woon-Il; Ha, Man-Lyun; Lee, Ju-Il; Lee, Song-Jae; Lee, Hi-Deok

    2013-01-01

    In this paper, electrical properties and reliability of high capacitance density Metal-Insulator-Metal (MIM) capacitor with sandwiched hafnium-based dielectric is analyzed using three kinds of voltage stress; constant voltage stress (CVS), unipolar voltage and bipolar voltage stresses. The fabricated MIM capacitor shows not only high capacitance density but also low leakage current density of about ˜10 nA/cm2 at room temperature and 1 V. The relative variation of capacitance (ΔC/C0) increases and the variation of voltage linearity (α/α0) gradually decreases with stress-time due to the charge trapping effect in the high-k dielectric. The relative variations of capacitance and voltage linearity show the greater change by the bipolar voltage stress than CVS and unipolar voltage stresses.

  10. Gate dielectric scaling in MOSFETs device

    NASA Astrophysics Data System (ADS)

    Jing, K. Hui; Arshad, M. K. Md.; Huda, A. R. N.; Ruslinda, A. R.; Gopinath, Subash C. B.; M. Nuzaihan M., N.; Ayub, R. M.; Fathil, M. F. M.; Othman, Noraini; Hashim, U.

    2016-07-01

    Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET) is a basic type of transistor to be used as a switch since 1959. Since then, the successful of MOSFET is due to good properties between silicon and silicon dioxide. The reduction of silicon oxide thickness provide further enhancement in device performance. At 90 and 65 nm technology nodes, the gate oxide could not be scaled anymore due to the direct tunneling effect resulting significant increase of leakage current. At 45 nm the high-k + metal gate has been introduced. Recently, the ferroelectric effect material is introduced which significantly reduce the gate leakage current. This paper review the evolution of gate dielectric scaling from the era of silicon dioxide to high-k + metal gate and ferroelectric effect material.

  11. Lipid bilayer coated Al(2)O(3) nanopore sensors: towards a hybrid biological solid-state nanopore.

    PubMed

    Venkatesan, Bala Murali; Polans, James; Comer, Jeffrey; Sridhar, Supriya; Wendell, David; Aksimentiev, Aleksei; Bashir, Rashid

    2011-08-01

    Solid-state nanopore sensors are highly versatile platforms for the rapid, label-free electrical detection and analysis of single molecules, applicable to next generation DNA sequencing. The versatility of this technology allows for both large scale device integration and interfacing with biological systems. Here we report on the development of a hybrid biological solid-state nanopore platform that incorporates a highly mobile lipid bilayer on a single solid-state Al(2)O(3) nanopore sensor, for the potential reconstitution of ion channels and biological nanopores. Such a system seeks to combine the superior electrical, thermal, and mechanical stability of Al(2)O(3) solid-state nanopores with the chemical specificity of biological nanopores. Bilayers on Al(2)O(3) exhibit higher diffusivity than those formed on TiO(2) and SiO(2) substrates, attributed to the presence of a thick hydration layer on Al(2)O(3), a key requirement to preserving the biological functionality of reconstituted membrane proteins. Molecular dynamics simulations demonstrate that the electrostatic repulsion between the dipole of the DOPC headgroup and the positively charged Al(2)O(3) surface may be responsible for the enhanced thickness of this hydration layer. Lipid bilayer coated Al(2)O(3) nanopore sensors exhibit excellent electrical properties and enhanced mechanical stability (GΩ seals for over 50 h), making this technology ideal for use in ion channel electrophysiology, the screening of ion channel active drugs and future integration with biological nanopores such as α-hemolysin and MspA for rapid single molecule DNA sequencing. This technology can find broad application in bio-nanotechnology. PMID:21487665

  12. Particle concentration and tube size dependence of viscosities of Al2O3-water nanofluids flowing through micro- and minitubes

    NASA Astrophysics Data System (ADS)

    Jang, Seok Pil; Lee, Ji-Hwan; Hwang, Kyo Sik; Choi, Stephen U. S.

    2007-12-01

    An experimental and theoretical investigation has been performed on the effective viscosity of Al2O3-water nanofluids flowing through micrometer- and millimeter-sized circular tubes in the fully developed laminar flow regime. We have discovered that the effective viscosity of Al2O3-water nanofluids increases nonlinearly with the volume concentration of nanoparticles even in the very low range of 0.02-0.3vol% and strongly depends on the ratio of the nanoparticle diameter to the tube diameter. We have developed a modified Einstein model that accounts for the slip mechanism in nanofluids. The new model captures these new rheological features of nanofluids.

  13. Photostimulated exoelectron emission in single crystals of anion-defective -Al2O3 exposed to electrons

    NASA Astrophysics Data System (ADS)

    Slesarev, A. I.; Kortov, V. S.

    2005-01-01

    In this study methods of exoemission analysis were used to examine main regular features of light and thermally stimulated processes in the near-surface layer of -Al2O3 crystals excited by electron radiation. The examination by methods of exoelectron spectroscopy showed that if the density of excitations in near-surface layers of -Al2O3 crystals is large, which is the case with pulsed high-current electron beams, an interactive interaction of trapping centers may show itself in the kinetics of the temperature relaxation of PSEE.

  14. One-nanometer-precision control of Al(2)O(3) nanoshells through a solution-based synthesis route.

    PubMed

    Zhang, Wei; Chi, Zi-Xiang; Mao, Wen-Xin; Lv, Rong-Wen; Cao, An-Min; Wan, Li-Jun

    2014-11-17

    Forming uniform metal oxide nanocoatings is a well-known challenge in the construction of core-shell type nanomaterials. Herein, by using buffer solution as a specific reaction medium, we demonstrate the possibility to grow thin nanoshells of metal oxides, typically Al2 O3 , on different kinds of core materials, forming a uniform surface-coating layer with thicknesses achieving one nanometer precision. The application of this methodology for the surface modification of LiCoO2 shows that a thin nanoshell of Al2 O3 can be readily tuned on the surface for an optimized battery performance. PMID:25336171

  15. Investigation of Aluminate and Al2O3 Crystals and Melts at High Temperature Using XANES Spectroscopy

    SciTech Connect

    Neuville, Daniel R.; Roux, Jacques; Cormier, Laurent; Henderson, Grant S.; Ligny, Dominique de; Flank, Anne-Marie; Lagarde, Pierre

    2007-02-02

    Using X-ray absorption at the Al K-edge at high temperature, structural information was determined on Al2O3, CaAl2O4 (CA), Ca3Al2O6 (C3A) and CaAl2Si2O8 (anorthite) in the crystalline and liquid states (2380 K). Important changes are observed for Al2O3 where all oscillation in the XANES spectra disappear above the liquidus temperature. For the three other compositions some modifications of the XANES spectra can be attributed to changes in the Al coordination.

  16. Optical decay of OSL signal of Al 2O 3: C detectors exposed to different light sources

    NASA Astrophysics Data System (ADS)

    Gronchi, C. C.; Cecatti, S. G. P.; Pinto, T. C. N. O.; Caldas, L. V. E.

    2008-06-01

    The optically stimulated luminescence technique has been utilized as an option for personal dosimetry due to a variety of factors, as the availability of commercially personal monitoring systems based on the OSL of Al2O3: C. In this work, the sensitivity of OSL detectors of Al2O3: C, Inlight personal dosimetry system, Landauer, was verified for different light levels. The results show that the percentage fading of OSL detectors exposed to 260 lux and 26,000 lux from fluorescent light varied between 16-24% and 76-91% in the first five minutes, respectively. The data confirmed the very high sensitivity to light of these detectors.

  17. Effects of Al2O3 Nanopowders on the Wear Behavior of NiTi Shape Memory Alloys

    NASA Astrophysics Data System (ADS)

    Şahin, Y.; Öksüz, K. Emre

    2014-01-01

    TiNi shape memory alloy and its composite using δ-Al2O3 nanosize particles were prepared by the powder metallurgy method, and some mechanical properties like hardness, wear, and corrosion behavior were investigated. The experimental results exhibited that the lower wear rate was obtained for the nano-Al2O3-reinforced Ti alloy composite due to increased hardness, but the wear rate increased considerably with increasing the load over 25 N for Ti alloy. However, the best corrosion resistance was obtained for the base alloy, which is very important for implant applications.

  18. Kinetics of NiO and NiCl2 hydrogen reduction as precursors and properties of produced Ni/Al2O3 and Ni-Pd/Al2O3 catalysts.

    PubMed

    Sokić, Miroslav; Kamberović, Željko; Nikolić, Vesna; Marković, Branislav; Korać, Marija; Anđić, Zoran; Gavrilovski, Milorad

    2015-01-01

    The objects of this investigation were the comparative kinetic analysis of the NiO and NiCl2 reduction by hydrogen during an induction period and elimination of the calcination during the synthesis of Ni/Al2O3 catalysts. The effect of temperature and time on NiO and NiCl2 reduction degrees was studied. Avrami I equation was selected as the most favorable kinetic model and used to determine activation energy of the NiO and NiCl2 reduction for the investigated temperature range (623-923 K) and time intervals (1-5 minutes). The investigation enabled reaching conclusions about the reaction ability and rate of the reduction processes. Afterward, Ni/Al2O3 catalysts were obtained by using oxide and chloride precursor for Ni. The catalysts were supported on alumina-based foam and prepared via aerosol route. Properties of the samples before and after low-temperature hydrogen reduction (633 K) were compared. Obtained results indicated that the synthesis of Ni/Al2O3 catalysts can be more efficient if chloride precursor for Ni is directly reduced by hydrogen during the synthesis process, without the calcination step. In addition, Ni-Pd/Al2O3 catalysts with different metal content were prepared by using chloride precursors. Lower reduction temperature was utilized and the chlorides were almost completely reduced at 533 K. PMID:25789335

  19. Kinetics of NiO and NiCl2 Hydrogen Reduction as Precursors and Properties of Produced Ni/Al2O3 and Ni-Pd/Al2O3 Catalysts

    PubMed Central

    Sokić, Miroslav; Kamberović, Željko; Nikolić, Vesna; Marković, Branislav; Korać, Marija; Anđić, Zoran; Gavrilovski, Milorad

    2015-01-01

    The objects of this investigation were the comparative kinetic analysis of the NiO and NiCl2 reduction by hydrogen during an induction period and elimination of the calcination during the synthesis of Ni/Al2O3 catalysts. The effect of temperature and time on NiO and NiCl2 reduction degrees was studied. Avrami I equation was selected as the most favorable kinetic model and used to determine activation energy of the NiO and NiCl2 reduction for the investigated temperature range (623–923 K) and time intervals (1–5 minutes). The investigation enabled reaching conclusions about the reaction ability and rate of the reduction processes. Afterward, Ni/Al2O3 catalysts were obtained by using oxide and chloride precursor for Ni. The catalysts were supported on alumina-based foam and prepared via aerosol route. Properties of the samples before and after low-temperature hydrogen reduction (633 K) were compared. Obtained results indicated that the synthesis of Ni/Al2O3 catalysts can be more efficient if chloride precursor for Ni is directly reduced by hydrogen during the synthesis process, without the calcination step. In addition, Ni-Pd/Al2O3 catalysts with different metal content were prepared by using chloride precursors. Lower reduction temperature was utilized and the chlorides were almost completely reduced at 533 K. PMID:25789335

  20. Effects of Al2O3 and CaO/SiO2 Ratio on Phase Equilbria in the ZnO-"FeO"-Al2O3-CaO-SiO2 System in Equilibrium with Metallic Iron

    NASA Astrophysics Data System (ADS)

    Zhao, Baojun; Hayes, Peter C.; Jak, Evgueni

    2011-02-01

    The phase equilibria and liquidus temperatures in the ZnO-"FeO"-Al2O3-CaO-SiO2 system in equilibrium with metallic iron have been determined experimentally in the temperature range 1383 K to 1573 K (1150 °C to 1300 °C). The experimental conditions were selected to characterize lead blast furnace and imperial smelting furnace slags. The results are presented in a form of pseudoternary sections ZnO-"FeO"-(Al2O3 + CaO + SiO2) with fixed CaO/SiO2 and (CaO + SiO2)/Al2O3 ratios. It was found that wustite and spinel are the major primary phases in the composition range investigated. Effects of Al2O3 concentration as well as the CaO/SiO2 ratio on the primary phase field, the liquidus temperature, and the partitioning of ZnO between liquid and solid phases have been discussed for zinc-containing slags.

  1. Phase separation, crystallization and polyamorphism in the Y(2)O(3)-Al(2)O(3) system.

    PubMed

    Skinner, Lawrie B; Barnes, Adrian C; Salmon, Philip S; Crichton, Wilson A

    2008-05-21

    A detailed study of glass formation from aerodynamically levitated liquids in the (Y(2)O(3))(x)(Al(2)O(3))(1-x) system for the composition range 0.21≤x≤0.41 was undertaken by using pyrometric, optical imaging and x-ray diffraction methods. Homogeneous and clear single-phase glasses were produced over the composition range [Formula: see text]. For Y(2)O(3)-rich compositions ([Formula: see text]), cloudy materials were produced which contain inclusions of crystalline yttrium aluminium garnet (YAG) of diameter up to 40 µm in a glassy matrix. For Y(2)O(3)-poor compositions around x = 0.24, cloudy materials were also produced, but it was not possible to deduce whether this resulted from (i) sub-micron inclusions of a nano-crystalline or glassy material in a glassy matrix or (ii) a glass formed by spinodal decomposition. For x = 0.21, however, the sample cloudiness results from crystallization into at least two phases comprising yttrium aluminium perovskite and alumina. The associated pyrometric cooling curve shows slow recalescence events with a continuous and slow evolution of excess heat which contrasts with the sharp recalescence events observed for the crystallization of YAG at compositions near x = 0.375. The materials that are the most likely candidates for demonstrating homogeneous nucleation of a second liquid phase occur around x = 0.25, which corresponds to the limit for formation of a continuous random network of corner-shared AlO(4) tetrahedra. PMID:21694284

  2. Dehydrogenation of dodecahydro-N-ethylcarbazole on Pd/Al2O3 model catalysts.

    PubMed

    Sobota, Marek; Nikiforidis, Ioannis; Amende, Max; Sanmartín Zanón, Beatriz; Staudt, Thorsten; Höfert, Oliver; Lykhach, Yaroslava; Papp, Christian; Hieringer, Wolfgang; Laurin, Mathias; Assenbaum, Daniel; Wasserscheid, Peter; Steinrück, Hans-Peter; Görling, Andreas; Libuda, Jörg

    2011-10-01

    To elucidate the dehydrogenation mechanism of dodecahydro-N-ethylcarbazole (H(12)-NEC) on supported Pd catalysts, we have performed a model study under ultra high vacuum (UHV) conditions. H(12)-NEC and its final dehydrogenation product, N-ethylcarbazole (NEC), were deposited by physical vapor deposition (PVD) at temperatures between 120 K and 520 K onto a supported model catalyst, which consisted of Pd nanoparticles grown on a well-ordered alumina film on NiAl(110). Adsorption and thermally induced surface reactions were followed by infrared reflection absorption spectroscopy (IRAS) and high-resolution X-ray photoelectron spectroscopy (HR-XPS) in combination with density functional theory (DFT) calculations. It was shown that, at 120 K, H(12)-NEC adsorbs molecularly both on the Al(2)O(3)/NiAl(110) support and on the Pd particles. Initial activation of the molecule occurs through C-H bond scission at the 8a- and 9a-positions of the carbazole skeleton at temperatures above 170 K. Dehydrogenation successively proceeds with increasing temperature. Around 350 K, breakage of one C-N bond occurs accompanied by further dehydrogenation of the carbon skeleton. The decomposition intermediates reside on the surface up to 500 K. At higher temperatures, further decay to small fragments and atomic species is observed. These species block most of the absorption sites on the Pd particles, but can be oxidatively removed by heating in oxygen at 600 K, fully restoring the original adsorption properties of the model catalyst. PMID:21953930

  3. Solidification processing of Al-Al2O3 composite using turbine stirrer

    NASA Astrophysics Data System (ADS)

    Al-Jarrah, J. A.; Ray, S.; Ghosh, P. K.

    1998-06-01

    Solidification processing of Al-Al2O3 composites involves mixing of nonwetting alumina particles in molten aluminum alloy resulting in a slurry where the particles are often attached to bubbles sucked at the center of vortex below the stirrer. The internal surface of bubbles is eventually oxidized by oxygen from air entrapped in it. These bubble-particle combines may float or settle during casting depending on the overall density influencing the particle and porosity distribution in a cast composite ingot where the performance of a stirrer may be evaluated under a given condition of processing. Particle incorporation is more for turbine stirrers instead of flat blade stirrers, but the porosity also increases. Flotation of bubble-particle combines during casting of ingot results in higher particle content at the top. Microstructure shows clusters of particles along circular boundaries of thin oxides at the top of the ingot and sometimes at the bottom. This may be a consequence of filling of bubbles to different extents by surrounding liquid puncturing the oxide layer, if necessary, during solidification. When the manner of stirring is changed to 2 minutes of stirring of particles into molten alloy with an intermediate 2-minute period of no stirring before stirring the slurry again for 2 minutes, relatively uniform particle incorporation results along the height of cast ingot compared to that obtained by continuous stirring. This difference in particle distribution may be attributed to flotation of bubble-particle combines to release the particles on the top of the slurry when stirring ceases and its remixing into the slurry when it is stirred again. However, an increase in the intermediate period of no stirring and a higher processing temperature result in enhanced porosity and a more inhomogeneous particle distribution along the height of the ingot.

  4. Al(2)O(3(w))-Al(2)O(3(n))-ZrO(2) (TZ-3Y)(n) multi-scale nanocomposite: an alternative for different dental applications?

    PubMed

    Nevarez-Rascon, A; Aguilar-Elguezabal, A; Orrantia, E; Bocanegra-Bernal, M H

    2010-02-01

    The influence of the addition of Al(2)O(3) whiskers (2.5wt.% up to 30wt.%) on Vickers hardness and fracture toughness in an Al(2)O(3(n))+ZrO(2) (TZ-3Y)(n) (90, 80 and 70wt.%) composite was investigated. Green compacts were obtained by uniaxial pressing at 50MPa and pressureless sintering at 1500 degrees C in air for 2h. After sintering, relative densities ranging from 75% to 97% were reached. The whiskers resisted particle rearrangement owing to the extensive sliding distances along the whisker boundaries during sintering and the high length/diameter ratios. Sintering becomes more difficult with increasing whisker content, because whiskers come into contact with each other, forming a rigid network which hinders densification. The 2.5wt.% Al(2)O(3) whiskers+27.5wt.% Al(2)O(3) nanoparticles+70wt.% TZ-3Y composite showed a hardness>13GPa and a maximum fracture toughness of 6.9MPam(-1/2), with an average grain size of 0.4+/-0.17microm. The observed crack deflection was an important mechanism in the improved fracture toughness of the composite. In addition, the grain size and residual porosity also seem to be factors in obtaining a wide range of hardness as well as fracture toughness by varying the Al(2)O(3) whiskers and ZrO(2) (TZ-3Y) content. The use of alumina-whisker-reinforced composites in dental applications could be promising for increasing hardness and fracture toughness compared with other materials. The reported values for these composites can compete with those of commercially available materials in different dental applications. PMID:19560564

  5. Towards advanced structural analysis of iron oxide clusters on the surface of γ-Al2O3 using EXAFS

    NASA Astrophysics Data System (ADS)

    Boubnov, Alexey; Roppertz, Andreas; Kundrat, Matthew D.; Mangold, Stefan; Reznik, Boris; Jacob, Christoph R.; Kureti, Sven; Grunwaldt, Jan-Dierk

    2016-11-01

    Iron oxide centres are structurally investigated in 0.1% Fe/γ-Al2O3, which is known as highly active catalyst, for instance in the oxidation of CO. The sample was characterised by using X-ray absorption spectroscopy (XAS) in terms of X-ray absorption near-edge structure (XANES) and extended X-ray absorption fine structure (EXAFS), Mössbauer spectroscopy, X-ray diffraction (XRD) and transmission electron microscopy (TEM). These analyses evidenced high dispersion of the iron oxide entities without significant presence of bulk-like aggregates associated with the low Fe content of the catalyst. A library of structural models of Al2O3-supported surface Fe was created as input for EXAFS fitting. Additionally, several model structures of Fe substituting Al ions in bulk γ-Al2O3 were created with optimised geometry based on density-functional theory (DFT) calculations. From EXAFS refinement of the best 8 out of 24 models, it was found that the trivalent Fe ions are coordinated by 4-5 oxygen atoms and are located on octahedral lattice sites of the exposed surfaces of γ-Al2O3. These iron oxide species exist mainly as a mixture of monomeric and binuclear species and due to the low concentration represent suitable model systems as alternative to single crystal systems for structure-function relationships.

  6. High-density ordered Ag@Al2O3 nanobowl arrays in applications of surface-enhanced Raman spectroscopy

    NASA Astrophysics Data System (ADS)

    Kang, Mengyang; Zhang, Xiaoyan; Liu, Liwei; Zhou, Qingwei; Jin, Mingliang; Zhou, Guofu; Gao, Xingsen; Lu, Xubing; Zhang, Zhang; Liu, Junming

    2016-04-01

    In this paper, we demonstrate a high-performance surface-enhanced Raman scattering (SERS) substrate based on high-density ordered Ag@Al2O3 nanobowl arrays. By ion beam etching (IBE) the anodized aluminum oxide (AAO) and subsequent Ag coating, ordered Ag@Al2O3 nanobowl arrays were created on the Si substrate. Unlike the ‘hot spots’ generated between adjacent metallic nanostructures, the Ag@Al2O3 nanobowl introduced ‘hot spots’ on the metal boundary of its hemispherical cavity. Based on the analysis of SERS signals, the optimized SERS substrate of Ag@Al2O3 nanobowl arrays had both high sensitivity and large-area uniformity. A detection limit as low as 10-10 M was obtained using chemisorbed p-thiocresol (p-Tc) molecules, and the SERS signal was highly reproducible with a small standard deviation. The method opens up a new way to create highly sensitive SERS sensors with high-density ‘hot spots’, and it could play an important role in device design and corresponding biological and food safety monitoring applications.

  7. Al 2O 3 supported Ru catalysts prepared by thermolysis of Ru 3(CO) 12 for catalytic wet air oxidation

    NASA Astrophysics Data System (ADS)

    Yu, Chaoying; Zhao, Peiqing; Chen, Gexin; Hu, Bin

    2011-06-01

    Low loading catalysts Ru/γ-Al 2O 3 and Ru-Ce/γ-Al 2O 3 were prepared by thermolysis of Ru 3(CO) 12 on γ-Al 2O 3. The catalysts were characterized by XPS, XRD and SEM. Two new Ru species (Ru A and Ru B) were detected during the Ru 3(CO) 12 decomposition process due to chemical interaction with the active OH groups on the surface of Al 2O 3 support, and the reduction of them can lead to more dispersed metallic phases. The sample was completely decomposed at 673 K in H 2, and RuO 2 was formed with minor amounts of Ru 0. When the temperature was increased to 773 K to heat the sample, the ratio of Ru 0 to RuO 2 increased. However, after the addition of CeO 2, only RuO 2 was detected on surface. The catalysts exhibited high activities in Catalytic Wet Air Oxidation (CWAO) of different organic compounds at high concentration such as isopropyl alcohol, phenol, acetic acids and N,N-dimethylformamide, which is attributed to the better dispersion of Ru particles and the addition of CeO 2 further enhanced number of effectively active sites on the cluster-derived catalyst surface.

  8. Enhanced lithium battery with polyethylene oxide-based electrolyte containing silane-Al2 O3 ceramic filler.

    PubMed

    Zewde, Berhanu W; Admassie, Shimelis; Zimmermann, Jutta; Isfort, Christian Schulze; Scrosati, Bruno; Hassoun, Jusef

    2013-08-01

    A solid polymer electrolyte prepared by using a solvent-free, scalable technique is reported. The membrane is formed by low-energy ball milling followed by hot-pressing of dry powdered polyethylene oxide polymer, LiCF3 SO3 salt, and silane-treated Al2 O3 (Al2 O3 -ST) ceramic filler. The effects of the ceramic fillers on the properties of the ionically conducting solid electrolyte membrane are characterized by using electrochemical impedance spectroscopy, XRD, differential scanning calorimeter, SEM, and galvanostatic cycling in lithium cells with a LiFePO4 cathode. We demonstrate that the membrane containing Al2 O3 -ST ceramic filler performs well in terms of ionic conductivity, thermal properties, and lithium transference number. Furthermore, we show that the lithium cells, which use the new electrolyte together with the LiFePO4 electrode, operate within 65 and 90 °C with high efficiency and long cycle life. Hence, the Al2 O3 -ST ceramic can be efficiently used as a ceramic filler to enhance the performance of solid polymer electrolytes in lithium batteries. PMID:23757331

  9. Kinetics of adsorptive removal of DEClP and GB on impregnated Al2O3 nanoparticles.

    PubMed

    Saxena, Amit; Srivastava, Avanish K; Singh, Beer; Gupta, Arvind K; Suryanarayana, Malladi V S; Pandey, Pratibha

    2010-03-15

    Nanoparticles of AP-Al(2)O(3) (aero-gel produced alumina) have been produced by an alkoxide based synthesis involving aluminum powder, methanol, toluene and water. Thus produced alumina nanoparticles were characterized and the data indicated the formation of nanoparticles of alumina in the size range of 2-30 nm with high surface area (375 m(2)/g). Thereafter, these nanoparticles were impregnated with reactive chemicals. Adsorptive removal kinetics for DEClP (diethylchlorophosphate) and GB (isopropylmethylphosphonofluoridate, sarin) was monitored by GC-FID (gas chromatograph coupled with flame ionization detector) technique and found to be following pseudo first order reaction kinetics. Among impregnated AP-Al(2)O(3) nanoparticles based sorbent systems AP-Al(2)O(3) impregnated with 9-molybdo-3-vanadophosphoric acid (10%, w/w) was found to be the most reactive with least half-life values of 7 and 30 min for the removal of DEClP and GB, respectively, whereas unimpregnated AP-Al(2)O(3) nanoparticles showed the best adsorption potential among all studied systems. In addition to this, hydrolysis reaction {identified using GC/MS (gas chromatograph coupled with mass spectrometer) technique} was found to be the route of degradation of DEClP and GB on impregnated alumina nanoparticles. PMID:19926215

  10. Hydrogen purification for fuel cell using CuO/CeO 2-Al 2O 3 catalyst

    NASA Astrophysics Data System (ADS)

    Maciel, Cristhiane Guimarães; Profeti, Luciene Paula Roberto; Assaf, Elisabete Moreira; Assaf, José Mansur

    CuO/CeO 2, CuO/Al 2O 3 and CuO/CeO 2-Al 2O 3 catalysts, with CuO loading varying from 1 to 5 wt.%, were prepared by the citrate method and applied to the preferential oxidation of carbon monoxide in a reaction medium containing large amounts of hydrogen (PROX-CO). The compounds were characterized ex situ by X-ray diffraction, specific surface area measurements, temperature-programmed reduction and temperature-programmed reduction of oxidized surfaces; XANES-PROX in situ experiments were also carried out to study the copper oxidation state under PROX-CO conditions. These analyses showed that in the reaction medium the Cu 0 is present as dispersed particles. On the ceria, these metallic particles are smaller and more finely dispersed, resulting in a stronger metal-support interaction than in CuO/Al 2O 3 or CuO/CeO 2-Al 2O 3 catalysts, providing higher PROX-CO activity and better selectivity in the conversion of CO to CO 2 despite the greater BET area presented by samples supported on alumina. It is also shown that the lower CuO content, the higher metal dispersion and consequently the catalytic activity. The redox properties of the ceria support also contributed to catalytic performance.

  11. Microwave Band-Pass Filter with Aerosol-Deposited Al2O3-Polytetrafluoroethylene Composite Thick Films.

    PubMed

    Lee, Ji-Won; Koh, Jung-Hyuk

    2015-03-01

    Fabrication of microwave band-pass filter with coplanar waveguide with ground structure was realized by employing Al2O3-polytetrafluoroethylene (Al2O3-PTFE) composite thick films for integrated substrates produced by aerosol deposition (AD). In order to predict the performance of the band-pass filter, 3-D electromagnetic simulations were performed by high-frequency structure analysis. The thick Al2O3-PTFE composite films prepared by the AD process had submicron-sized Al2O3 crystallites due to the shock-absorbing effect of PTFE during the film growth. The thick films were characterized by X-ray diffraction and scanning electron microscopy. The Cu transmission lines with the thickness of 300 nm were deposited by electron-beam evaporation to form the band-pass filter. The fabricated band-pass filter showed similar characteristics to the simulation results. The insertion loss and resonance frequency were 9.5 dB and 2.3 GHz, respectively. PMID:26413656

  12. Stacked Graphene-Al2O3 Nanopore Sensors for Sensitive Detection of DNA and DNA-Protein Complexes

    PubMed Central

    Venkatesan, Bala Murali; Estrada, David; Banerjee, Shouvik; Jin, Xiaozhong; Dorgan, Vincent E.; Bae, Myung-Ho; Aluru, Narayana R.; Pop, Eric; Bashir, Rashid

    2012-01-01

    We report the development of a multilayered graphene-Al2O3 nanopore platform for the sensitive detection of DNA and DNA-protein complexes. Graphene-Al2O3 nanolaminate membranes are formed by sequentially depositing layers of graphene and Al2O3 with nanopores being formed in these membranes using an electron-beam sculpting process. The resulting nanopores are highly robust, exhibit low electrical noise (significantly lower than nanopores in pure graphene), are highly sensitive to electrolyte pH at low KCl concentrations (attributed to the high buffer capacity of Al2O3) and permit the electrical biasing of the embedded graphene electrode, thereby allowing for three terminal nanopore measurements. In proof-of-principle biomolecule sensing experiments, the folded and unfolded transport of single DNA molecules and RecA coated DNA complexes could be discerned with high temporal resolution. The process described here also enables nanopore integration with new graphene based structures, including nanoribbons and nanogaps, for single molecule DNA sequencing and medical diagnostic applications. PMID:22165962

  13. Epoxidation of alkenes through oxygen activation over a bifunctional CuO/Al2O3 catalyst.

    PubMed

    Scotti, Nicola; Ravasio, Nicoletta; Zaccheria, Federica; Psaro, Rinaldo; Evangelisti, Claudio

    2013-03-01

    The epoxidation of alkenes was carried out over a CuO/Al(2)O(3) catalyst using cumene as an oxygen carrier, through a one-pot reaction, giving high conversion and selectivity with different substrates. Trans-β-methylstyrene gave the corresponding epoxide in 95% yield after 3 h. PMID:23358661

  14. High-κ Al2O3 material in low temperature wafer-level bonding for 3D integration application

    NASA Astrophysics Data System (ADS)

    Fan, J.; Tu, L. C.; Tan, C. S.

    2014-03-01

    This work systematically investigated a high-κ Al2O3 material for low temperature wafer-level bonding for potential applications in 3D microsystems. A clean Si wafer with an Al2O3 layer thickness of 50 nm was applied as our experimental approach. Bonding was initiated in a clean room ambient after surface activation, followed by annealing under inert ambient conditions at 300 °C for 3 h. The investigation consisted of three parts: a mechanical support study using the four-point bending method, hermeticity measurements using the helium bomb test, and thermal conductivity analysis for potential heterogeneous bonding. Compared with samples bonded using a conventional oxide bonding material (SiO2), a higher interfacial adhesion energy (˜11.93 J/m2) and a lower helium leak rate (˜6.84 × 10-10 atm.cm3/sec) were detected for samples bonded using Al2O3. More importantly, due to the excellent thermal conductivity performance of Al2O3, this technology can be used in heterogeneous direct bonding, which has potential applications for enhancing the performance of Si photonic integrated devices.

  15. Stacked graphene-Al2O3 nanopore sensors for sensitive detection of DNA and DNA-protein complexes.

    PubMed

    Venkatesan, Bala Murali; Estrada, David; Banerjee, Shouvik; Jin, Xiaozhong; Dorgan, Vincent E; Bae, Myung-Ho; Aluru, Narayana R; Pop, Eric; Bashir, Rashid

    2012-01-24

    We report the development of a multilayered graphene-Al(2)O(3) nanopore platform for the sensitive detection of DNA and DNA-protein complexes. Graphene-Al(2)O(3) nanolaminate membranes are formed by sequentially depositing layers of graphene and Al(2)O(3), with nanopores being formed in these membranes using an electron-beam sculpting process. The resulting nanopores are highly robust, exhibit low electrical noise (significantly lower than nanopores in pure graphene), are highly sensitive to electrolyte pH at low KCl concentrations (attributed to the high buffer capacity of Al(2)O(3)), and permit the electrical biasing of the embedded graphene electrode, thereby allowing for three terminal nanopore measurements. In proof-of-principle biomolecule sensing experiments, the folded and unfolded transport of single DNA molecules and RecA-coated DNA complexes could be discerned with high temporal resolution. The process described here also enables nanopore integration with new graphene-based structures, including nanoribbons and nanogaps, for single-molecule DNA sequencing and medical diagnostic applications. PMID:22165962

  16. Performance characterization of CNTs and γ-Al2O3 supported cobalt catalysts in Fischer-Tropsch reaction

    NASA Astrophysics Data System (ADS)

    Ali, Sardar; Zabidi, Noor Asmawati Mohd; Subbarao, Duvvuri

    2014-10-01

    Catalysts were prepared via a wet impregnation method. Different physicochemical properties of the samples were revealed by transmission electron microscope (TEM), temperature programmed reduction (H2-TPR) and carbon dioxide desorption (CO2-desorption). Fischer-Tropsch reaction (FTS) was carried out in a fixed-bed microreactor at 220°C and 1 atm, with H2/ CO = 2v / v and space velocity, SV of 12L/g.h for 5 h. Various characterization techniques revealed that there was a stronger interaction between Co and Al2O3 support compared to that of CNTs support. CNTs support increased the reducibility and decreased Co particle size. A significant increase in % CO conversion and FTS reaction rate was observed over CNTs support compared to that of Co / Al2O3. Co/CNTs resulted in higher C5+ hydrocarbons selectivity compared to that of Co / Al2O3 catalyst. CNTs are a better support for Co compared to Al2O3.

  17. Slurry Erosion Performance of Ni-Al2O3 Based Thermal-Sprayed Coatings: Effect of Angle of Impingement

    NASA Astrophysics Data System (ADS)

    Grewal, H. S.; Agrawal, Anupam; Singh, H.; Shollock, B. A.

    2014-02-01

    In this paper, slurry erosion performance of high velocity flame-sprayed Ni-Al2O3 based coatings was evaluated. The coatings were deposited on a hydroturbine steel (CA6NM) by varying the content of Al2O3 in Ni. Using jet-type test rig, erosion behavior of coatings and bare steel was evaluated at different impingement angles. Detailed investigation of the surface morphology of the eroded specimens was undertaken using SEM/EDS to identify potential erosion mechanism. A parameter named "erosion mechanism identifier" (ξ) was used to predict the mode of erosion. It was observed that the coating prepared using 40 wt.% of Al2O3 showed a highest resistance to erosion. This coating enhanced the erosion resistance of the steel by 2 to 4 times. Spalling in the form of splats and chunks of material (formed by interlinking of cracks) along with fracture of Al2O3 splats were identified as primary mechanisms responsible for the loss of coating material. The erosion mechanism of coatings and bare steel predicted by ξ was in good agreement with that observed experimentally. Among different parameters,, a function of fracture toughness ( K IC) and hardness ( H) showed excellent correlation with erosion resistance of coatings at both the impingement angles.

  18. Catalytic oxidation of elemental mercury over the modified catalyst Mn/alpha-Al2O3 at lower temperatures.

    PubMed

    Li, Jianfeng; Yan, Naiqiang; Qu, Zan; Qiao, Shaohua; Yang, Shijian; Guo, Yongfu; Liu, Ping; Jia, Jinping

    2010-01-01

    In order to facilitate the removal of elemental mercury (Hg(0)) from coal-fired flue gas, catalytic oxidation of Hg(0) with manganese oxides supported on inert alumina (alpha-Al2O3) was investigated at lower temperatures (373-473 K). To improve the catalytic activity and the sulfur-tolerance of the catalysts at lower temperatures, several metal elements were employed as dopants to modify the catalyst of Mn/alpha-Al2O3. The best performance among the tested elements was achieved with molybdenum (Mo) as the dopant in the catalysts. It can work even better than the noble metal catalyst Pd/alpha-Al2O3. Additionally, the Mo doped catalyst displayed excellent sulfur-tolerance performance at lower temperatures, and the catalytic oxidation efficiency for Mo(0.03)-Mn/alpha-Al2O3 was over 95% in the presence of 500 ppm SO2 versus only about 48% for the unmodified catalyst. The apparent catalytic reaction rate constant increased by approximately 5.5 times at 423 K. In addition, the possible mechanisms involved in Hg(0) oxidation and the reaction with the Mo modified catalyst have been discussed. PMID:19950921

  19. Infrared Spectroscopic Study of ClCN Adsorption on Clean and Triethylenediamine-Precovered y-Al2O3

    SciTech Connect

    Kim, S.; Sorescu, D.C.; Yates, J., Jr.

    2007-12-13

    The effect of triethylenediamine (TEDA) (also named 1,4-diazabicyclo [2.2.2]octane, DABCO) on the adsorption of ClCN on a y-Al2O3 absorbent has been investigated. Both Fourier transform infrared (FTIR) and theoretical studies indicate that no direct interaction between amine groups of TEDA and ClCN molecules takes place. Instead, we found that TEDA competes with ClCN for active surface sites on y-Al2O3. In addition, the adsorption behavior of cyanogen chloride (ClCN) on a clean y-Al2O3 surface has been studied. The sequence of the thermally activated processes of diffusion, adsorption, desorption, and decomposition of ClCN molecules on the clean y-Al2O3 surface following icelike ClCN layer formation at lower temperature was observed. One of the decomposition products, Al-NCO, was assigned by using an Al-18OH labeled surface for reaction with ClCN. In addition, Al-CN and Al2-OCN species were also detected upon ClCN decomposition. Good correlation of the calculated vibrational frequencies for the adsorbed species with experimental data is found.

  20. Phase progression of γ-Al2O3 nanoparticles synthesized in a solvent-deficient environment.

    PubMed

    Smith, Stacey J; Amin, Samrat; Woodfield, Brian F; Boerio-Goates, Juliana; Campbell, Branton J

    2013-04-15

    Our simple and uniquely cost-effective solvent-deficient synthetic method produces 3-5 nm Al2O3 nanoparticles which show promise as improved industrial catalyst-supports. While catalytic applications are sensitive to the details of the atomic structure, a diffraction analysis of alumina nanoparticles is challenging because of extreme size/microstrain-related peak broadening and the similarity of the diffraction patterns of various transitional Al2O3 phases. Here, we employ a combination of X-ray pair-distribution function (PDF) and Rietveld methods, together with solid-state NMR and thermogravimetry/differential thermal analysis-mass spectrometry (TG/DTA-MS), to characterize the alumina phase-progression in our nanoparticles as a function of calcination temperature between 300 and 1200 °C. In the solvent-deficient synthetic environment, a boehmite precursor phase forms which transitions to γ-Al2O3 at an extraordinarily low temperature (below 300 °C), but this γ-Al2O3 is initially riddled with boehmite-like stacking-fault defects that steadily disappear during calcination in the range from 300 to 950 °C. The healing of these defects accounts for many of the most interesting and widely reported properties of the γ-phase. PMID:23557087

  1. Structural characterization and catalytic activity of Pt dendrimer encapsulated nanoparticles supported over Al2O3 for SCR of NOx.

    PubMed

    Bae, HyunSook; Rao, Komateedi N; Ha, HeonPhil

    2011-07-01

    Pt/Al2O3 and Pt-Mg/Al2O3 nano composites were successfully prepared by dendrimer templated synthesis route. The obtained dendritic nanoparticles were dispersed in alumina support and they were evaluated for SCR of NOx using methane as reductant. Thermal analysis results of uncalcined samples revealed that the oxygen can accelerate the rate of dendrimer shell decomposition. X-ray diffractograms of 500 degrees C calcined samples disclosed the amorphous nature of materials, whereas 1000 degrees C air calcined samples showed enhanced crystallinity as well as diffraction pattern corresponding to Pt and PtO. HRTEM images of Pt40-G4OH dendritic nanoparticles showed uniform particulate distribution with average particle size of 2.4 nm. The STEM results of 0.5 Pt/Al2O3 sample calcined at 500 degrees C exhibited a wide range of particles between 2 and 20 nm. This indicates the huge segregation of platinum metal particles during impregnation and subsequent calcination. Among the synthesized materials 0.5 wt% Pt/Al2O3 sample showed excellent conversion and selectivity for SCR of NOx. PMID:22121673

  2. Investigation of neutron converters for production of optically stimulated luminescence (OSL) neutron dosimeters using Al 2O 3:C

    NASA Astrophysics Data System (ADS)

    Mittani, J. C. R.; da Silva, A. A. R.; Vanhavere, F.; Akselrod, M. S.; Yukihara, E. G.

    2007-07-01

    This paper presents the optically stimulated luminescence (OSL) properties of neutron dosimeters in powder and in the form of pellets prepared with a mixture of Al 2O 3:C and neutron converters. The neutron converters investigated were high density polyethylene (HDPE), lithium fluoride (LiF), lithium fluoride 95% enriched with 6Li ( 6LiF), lithium carbonate 95% enriched with 6Li ( 6Li 2CO 3), boric acid enriched with 99% of 10B (H310BO) and gadolinium oxide (Gd 2O 3). The proportion of Al 2O 3:C and neutron converter in the mixture was varied to optimize the total OSL signal and neutron sensitivity. The neutron sensitivity and dose-response were determined for the OSL dosimeters using a bare 252Cf source and compared to the response of Harshaw TLD-600 and TLD-700 dosimeters ( 6LiF:Mg,Ti and 7LiF:Mg,Ti). The results demonstrate the possibility of developing an OSL dosimeter made of Al 2O 3:C powder and neutron converter with a neutron sensitivity (defined as the ratio between the 60Co equivalent gamma dose and the reference neutron absorbed dose) and neutron-gamma discrimination comparable to the TLD-600/TLD-700 combination. It was shown that the shape of the OSL decay curves varied with the type of the neutron converter, demonstrating the influence of the energy deposition mechanism and ionization density on the OSL process in Al 2O 3:C.

  3. Intracavity frequency doubling of a 2,5-kHz pulsed Ti:Al2O3 laser

    NASA Astrophysics Data System (ADS)

    Poirier, P.; Hanson, F.

    1993-11-01

    An intracavity frequency doubled Ti:Al2O3 laser using a cw-pumped, repetitively Q-switched Nd:YAG laser as pump source is reported. Thus an efficient tunable blue source is obtained that provides a reliable all solid state system based on laser diode pumping.

  4. Superior high-temperature oxidation resistance of a novel (Al2O3-Y2O3)/Pt laminated coating

    NASA Astrophysics Data System (ADS)

    Ma, Xiaoxu; He, Yedong; Wang, Deren; Zhang, Jin

    2012-03-01

    A 7-layer (Al2O3-Y2O3)/Pt laminated coating was successfully prepared on a Ni-based superalloy by magnetron sputtering methods. It is observed that the as-prepared coating has dense and refined brittle/ductile laminated nanostructure. Cyclic oxidation tests were adopted to investigate the oxidation and spallation resistance of this novel laminated coating. The results revealed that the 7-layer (Al2O3-Y2O3)/Pt laminated coating can significantly improve the high-temperature oxidation resistance and spallation resistance of the Ni-based superalloy. In such laminated coating, the multi-sealed (Al2O3-Y2O3) and Pt layers can effectively suppress the inward diffusion of oxygen to an extremely low level, providing super oxidation resistance at 1200 °C for 1000 h. In addition, the excellent high-temperature mechanical properties of the (Al2O3-Y2O3)/Pt laminated coating are mainly induced by the increased thermal expansion coefficient and the brittle/ductile laminated composite structure by means of energy release mechanisms.

  5. Study on Viscosity of the La2O3-SiO2-Al2O3 Slag System

    NASA Astrophysics Data System (ADS)

    Deng, Yong-chun; Wu, Sheng-li; Jiang, Yin-ju; Jia, Su-qi

    2016-08-01

    The viscosities and free-running temperatures of slag in a La2O3-SiO2-Al2O3 slag system were measured using an internal rotating cylinder method. For different La2O3 mass contents (45, 50, and 55 pct) in the La2O3-SiO2-Al2O3 ternary slag, the slag viscosity and free-running temperature decreased with a decrease in SiO2 content and an increase in Al2O3 content, and decreased with an increase in La2O3 content. Minor components B2O3, FeO, and MnO could decrease the viscosity and free-running temperature of La2O3-SiO2-Al2O3 ternary slag, especially FeO, and a small amount of FeO and B2O3 had an additive effect on slag viscosity and free-running temperature reduction.

  6. Effects of Al2O3-Cu/water hybrid nanofluid on heat transfer and flow characteristics in turbulent regime

    NASA Astrophysics Data System (ADS)

    Takabi, Behrouz; Shokouhmand, Hossein

    2015-09-01

    In this paper, forced convection of a turbulent flow of pure water, Al2O3/water nanofluid and Al2O3-Cu/water hybrid nanofluid (a new advanced nanofluid composited of Cu and Al2O3 nanoparticles) through a uniform heated circular tube is numerically analyzed. This paper examines the effects of these three fluids as the working fluids, a wide range of Reynolds number (10 000 ≤ Re ≤ 10 0000) and also the volume concentration (0% ≤ ϕ ≤ 2%) on heat transfer and hydrodynamic performance. The finite volume discretization method is employed to solve the set of the governing equations. The results indicate that employing hybrid nanofluid improves the heat transfer rate with respect to pure water and nanofluid, yet it reveals an adverse effect on friction factor and appears severely outweighed by pressure drop penalty. However, the average increase of the average Nusselt number (when compared to pure water) in Al2O3-Cu/water hybrid nanofluid is 32.07% and the amount for the average increase of friction factor would be 13.76%.

  7. Nature, density, and catalytic role of exposed species on dispersed VOx/CrOx/Al2O3 catalysts.

    PubMed

    Yang, Shuwu; Iglesia, Enrique; Bell, Alexis T

    2006-02-16

    The structure and surface composition of binary oxides consisting of CrO(x) and VO(x) dispersed on alumina and their effects on the rate and selectivity of oxidative dehydrogenation (ODH) of propane were examined and compared with those for CrO(x) and VO(x) dispersed on alumina. VO(x) deposition on an equivalent CrO(x) monolayer on alumina and deposition of CrO(x) on an equivalent monolayer of VO(x) deposited on alumina led to CrVO(4) species during thermal treatment with concomitant reduction of Cr(6+) to Cr(3+). Autoreduction of Cr(6+) to Cr(3+) is also detected for CrO(x), even without the presence of VO(x). Infrared spectroscopy of NO adsorbed at 153 K probes the relative abundance of alumina and of V(5+), Cr(3+), and Cr(6+) at surfaces. This technique detects differences in the surface composition of VO(x)/CrO(x)()/Al(2)O(3) and CrO(x)/VO(x)/Al(2)O(3). The first of these samples is enriched in VO(x) relative to CrO(x) compared with the second sample. Consistent with this finding, VO(x)/CrO(x)/Al(2)O(3) and CrO(x)/VO(x)/Al(2)O(3) are distinguishable in their ODH activities and propene selectivities. The highest ODH activity and propene selectivity is observed for VO(x)/CrO(x)/Al(2)O(3), which exhibits a surface enriched in VO(x) and having a low surface concentration of Cr(6+). PMID:16471878

  8. Role of Tricoordinate Al Sites in CH3ReO3/Al2O3 Olefin Metathesis Catalysts.

    PubMed

    Valla, Maxence; Wischert, Raphael; Comas-Vives, Aleix; Conley, Matthew P; Verel, René; Copéret, Christophe; Sautet, Philippe

    2016-06-01

    Re2O7 supported on γ-alumina is an alkene metathesis catalyst active at room temperature, compatible with functional groups, but the exact structures of the active sites are unknown. Using CH3ReO3/Al2O3 as a model for Re2O7/Al2O3, we show through a combination of reactivity studies, in situ solid-state NMR, and an extensive series of DFT calculations, that μ-methylene structures (Al-CH2-ReO3-Al) containing a Re═O bound to a tricoordinated Al (AlIII) and CH2 bound to a four-coordinated Al (AlIVb) are the precursors of the most active sites for olefin metathesis. The resting state of CH3ReO3/Al2O3 is a distribution of μ-methylene species formed by the activation of the C-H bond of CH3ReO3 on different surface Al-O sites. In situ reaction with ethylene results in the formation of Re metallacycle intermediates, which were studied in detail through a combination of solid-state NMR experiments, using labeled ethylene, and DFT calculations. In particular, we were able to distinguish between metallacycles in TBP (trigonal-bipyramidal) and SP (square-pyramidal) geometry, the latter being inactive and detrimental to catalytic activity. The SP sites are more likely to be formed on other Al sites (AlIVa/AlIVa). Experimentally, the activity of CH3ReO3/Al2O3 depends on the activation temperature of alumina; catalysts activated at or above 500 °C contain more active sites than those activated at 300 °C. We show that the dependence of catalytic activity on the Al2O3 activation temperature is related to the quantity of available AlIII-defect sites and adsorbed H2O. PMID:27140286

  9. Effect of Al2O3 on the Crystallization of Mold Flux for Casting High Al Steel

    NASA Astrophysics Data System (ADS)

    Zhou, Lejun; Wang, Wanlin; Zhou, Kechao

    2015-06-01

    In order to lower the weight of automotive bodies for better fuel-efficiency and occupant safety, the demand for high Al-containing advanced high strength steel, such as transformation-induced plasticity and twinning-induced plasticity steel, is increasing. However, high aluminum content in steels would tend to significantly affect the properties of mold flux during the continuous casting process. In this paper, a kinetic study of the effect of Al2O3 content on the crystallization behavior of mold flux was conducted by using the single hot thermocouple technique and the Johnson-Mehl-Avrami model combined with the Arrhenius Equation. The results suggested that Al2O3 behaves as an amphoteric oxide in the crystallization process of mold flux. The precipitated phases of mold flux change from cuspidine (Ca4Si2O7F2) into nepheline (NaAlSiO4) and CaF2, and then into gehlenite (Ca2Al2SiO7) with the increase of Al2O3 content. The kinetics study of the isothermal crystallization process indicated that the effective crystallization rate ( k) and Avrami exponent ( n) also first increased and then decreased with the increase of Al2O3 content. The values for the crystallization activation energy of mold flux with different Al2O3 contents were E R0.8A7 = 150.76 ± 17.89 kJ/mol, E R0.8A20 = 136.43 ± 6.48 kJ/mol, E R0.8A30 = 108.63 ± 12.25 kJ/mol and E R0.8A40 = 116.15 ± 8.17 kJ/mol.

  10. ZnO-based thin film transistors employing aluminum titanate gate dielectrics deposited by spray pyrolysis at ambient air.

    PubMed

    Afouxenidis, Dimitrios; Mazzocco, Riccardo; Vourlias, Georgios; Livesley, Peter J; Krier, Anthony; Milne, William I; Kolosov, Oleg; Adamopoulos, George

    2015-04-01

    The replacement of SiO2 gate dielectrics with metal oxides of higher dielectric constant has led to the investigation of a wide range of materials with superior properties compared with SiO2. Despite their attractive properties, these high-k dielectrics are usually manufactured using costly vacuum-based techniques. To overcome this bottleneck, research has focused on the development of alternative deposition methods based on solution-processable metal oxides. Here we report the application of spray pyrolysis for the deposition and investigation of Al2x-1·TixOy dielectrics as a function of the [Ti(4+)]/[Ti(4+)+2·Al(3+)] ratio and their implementation in thin film transistors (TFTs) employing spray-coated ZnO as the active semiconducting channels. The films are studied by UV-visible absorption spectroscopy, spectroscopic ellipsometry, impedance spectroscopy, atomic force microscopy, X-ray diffraction and field-effect measurements. Analyses reveal amorphous Al2x-1·TixOy dielectrics that exhibit a wide band gap (∼4.5 eV), low roughness (∼0.9 nm), high dielectric constant (k ∼ 13), Schottky pinning factor S of ∼0.44 and very low leakage currents (<5 nA/cm(2)). TFTs employing stoichiometric Al2O3·TiO2 gate dielectrics and ZnO semiconducting channels exhibit excellent electron transport characteristics with low operating voltages (∼10 V), negligible hysteresis, high on/off current modulation ratio of ∼10(6), subthreshold swing (SS) of ∼550 mV/dec and electron mobility of ∼10 cm(2) V(-1) s(-1). PMID:25774574

  11. Synthesis, sintering and characterization of Al2O 3-TiC nano-composites powders from carbon coated precursors

    NASA Astrophysics Data System (ADS)

    Kaga, Hisashi

    Synthesis, sintering and characterization of Al2O3-TiC nano-composite powders from carbon coated precursors were investigated. Degussa P-25 titanium dioxide, Cabot carbon black, and Alfa Aesar aluminum were the initial starting powders. Hydrocarbon gas (C3H6) was used as the carbon source for the carbon coated precursors. Analytical methods employed in this research were BET surface area measurement, X-ray diffraction (XRD), transmission electron microscopy (TEM), scanning electron microscopy (SEM), Vickers hardness tester, and differential scanning calorimetry (DSC). For Al2O3-TiC formation studies, three different types of precursors which are carbon coated TiO2/Al mixture, mixture of carbon coated TiO2 and Al, and standard mixture of TiO 2, Al, and carbon black were prepared to examine formation mechanism reaction. The carbon coated TiO2/Al mixture dramatically changed the reaction mechanism and produced high quality nanosize Al2O 3-TiC powders. XRD and BET results showed that the carbon coated TiO 2/Al synthesized at 1200°C had only Al2O3 and TiC phases with high surface area about 22m2/g which were formed via intermediate phases of Ti2O3 and Al 3Ti. TEM results showed that the produced Al2O3-TiC powders had fine particle size (20--80 nm), narrow particle size distribution, and freely agglomerated. DSC curve and XRD results of the carbon coated TiO 2/Al mixture also showed that there were two endothermic and three successive weak exothermic reactions because released heat was controlled by the carbon coating. Experimentally determined the first exothermic reaction 5Al + 3TiO 2 → Al2O3 + Ti2O3 + Al3Ti which was compared with theoretical explanation model and they were found to be in agreement. Sintering behavior of nano-size Al 2O3-TiC synthesized from carbon coated precursors was investigated in Al2O3-TiC-MgO system using pressureless sintering and hot-pressing methods. After pressureless sintering, MgO doped Al 2O3-20wt.%TiC resulted in 98% of theoretical

  12. Comparative Study of CuO Species on CuO/Al2O3, CuO/CeO2-Al2O3 and CuO/La2O-Al2O3 Catalysts for CO Oxidation

    NASA Astrophysics Data System (ADS)

    Jin, Ling-yun; He, Mai; Lu, Ji-qing; Luo, Meng-fei; Fang, Ping; Xie, Yun-long

    2007-10-01

    CuO/Al2O3, CuO/CeO2-Al2O3, and CuO/La2O3-Al2O3 (denoted as Cu/Al, Cu/CeAl, and Cu/LaAl) catalysts were prepared by an impregnation method. CuO species and CuO/Al2O3 thermal solid-solid interaction were characterized by in situ XRD, Raman spectroscopy and H2-TPR techniques. For the Cu/Al catalyst, a CuAl2O4 phase exists between the CuO and Al2O3 layer and the CuO phase exists on the surface in both highly dispersed and bulk forms. For the Cu/CeAl catalyst, there is highly dispersed and bulk CuO on the surface, but most of the CuO has transferred into the internal layer of CeO2 as bulk CuO and CuAl2O4. For the Cu/LaAl catalyst, only bulk CuO is present on the surface of the catalyst and no CuAl2O4 is formed. The catalytic activity order for CO oxidation is Cu/CeAl>Cu/Al>Cu/LaAl. The highly dispersed CuO on the catalyst surface may be the active phase for CO oxidation. The results show that the addition of CeO2 not only promotes both the transference of CuO and the formation of CuAl2O4 but also favors the CO oxidation due to the association of highly dispersed CuO with CeO2, while La2O3 hinders the transference of CuO and the formation of CuAl2O4.

  13. Electrical and structural characterizations of crystallized Al2O3/GaN interfaces formed by in situ metalorganic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Liu, X.; Jackson, C. M.; Wu, F.; Mazumder, B.; Yeluri, R.; Kim, J.; Keller, S.; Arehart, A. R.; Ringel, S. A.; Speck, J. S.; Mishra, U. K.

    2016-01-01

    Al2O3 films were grown in situ by metalorganic chemical vapor deposition at 900 °C on GaN of both Ga- and N-face polarities. High-resolution transmission electron microscopy revealed that the Al2O3 films were crystalline and primarily γ-phase. The Al2O3/Ga-GaN and Al2O3/N-GaN interfaces were both atomically sharp, and the latter further exhibited a biatomic step feature. The corresponding current-voltage (J-V) characteristics were measured on a metal-Al2O3-semiconductor capacitor (MOSCAP) structure. The leakage current was very high when the Al2O3 thickness was comparable with the size of the crystalline defects, but was suppressed to the order of 1 × 10-8 A/cm2 with larger Al2O3 thicknesses. The interface states densities (Dit) were measured on the same MOSCAPs by using combined ultraviolet (UV)-assisted capacitance-voltage (C-V), constant capacitance deep level transient spectroscopy (CC-DLTS), and constant capacitance deep level optical spectroscopy (CC-DLOS) techniques. The average Dit measured by CC-DLTS and CC-DLOS were 6.6 × 1012 and 8.8 × 1012 cm-2 eV-1 for Al2O3/Ga-GaN and 8.6 × 1012 and 8.6 × 1012 cm-2 eV-1 for Al2O3/N-GaN, respectively. The possible origins of the positive (negative) polarization compensation charges in Al2O3/Ga-GaN (Al2O3/N-GaN), including the filling of interface states and the existence of structure defects and impurities in the Al2O3 layer, were discussed in accordance with the experimental results and relevant studies in the literature.

  14. Low-temperature growth of single-walled carbon nanotube using Al2O3/Pd/Al2O3 multilayer catalyst by alcohol gas source method at high vacuum

    NASA Astrophysics Data System (ADS)

    Kiribayashi, Hoshimitsu; Ogawa, Seigo; Kozawa, Akinari; Saida, Takahiro; Naritsuka, Shigeya; Maruyama, Takahiro

    2016-06-01

    We carried out single-walled carbon nanotube (SWCNT) growth at 500 and 600 °C using Al2O3/Pd/Al2O3 multilayer catalysts on SiO2/Si substrates by the alcohol gas source method. When the ethanol pressures were 1 × 10‑4 and 1 × 10‑3 Pa, radial-breathing-mode (RBM) peaks and sharp G band peaks appeared in Raman spectra, indicating the growth of SWCNTs even at 500 °C. When the growth temperature and ethanol pressure were 500 °C and 1 × 10‑4 Pa, respectively, the growth rate decreased gradually with the growth time, but the SWCNT growth continued for more than 4 h and the diameter distribution changed as the growth proceeded. X-ray photoelectron spectroscopy measurements showed that oxidized Pd catalyst particles were reduced to metallic states after the SWCNT growth started.

  15. Hydroprocessing of Jatropha Oil for Production of Green Diesel over Non-sulfided Ni-PTA/Al2O3 Catalyst

    PubMed Central

    Liu, Jing; Lei, Jiandu; He, Jing; Deng, Lihong; Wang, Luying; Fan, Kai; Rong, Long

    2015-01-01

    The non-sulfided Ni-PTA/Al2O3 catalyst was developed to produce green diesel from the hydroprocessing of Jatropha oil. The Ni-PTA/Al2O3 catalyst was prepared by one-pot synthesis of Ni/Al2O3 with the co-precipitation method and then impregnanting Ni/Al2O3 with PTA solution. The catalysts were characterized with BET, SEM-EDX, TEM, XRD, XPS, TGA and NH3-TPD. The Ni and W species of the Ni-PTA/Al2O3 catalyst were much more homogeneously distributed on the surface than that of commercial Al2O3. Catalytic performance in the hydroprocessing of Jatropha oil was evaluated by GC. The maximum conversion of Jatropha oil (98.5 wt%) and selectivity of the C15-C18 alkanes fraction (84.5 wt %) occurred at 360 °C, 3.0 MPa, 0.8 h−1. The non-sulfided Ni-PTA/Al2O3 catalyst is more environmentally friendly than the conventional sulfided hydroprocessing catalyst, and it exhibited the highest catalytic activity than the Ni-PTA catalyst supported with commercial Al2O3 grain and Al2O3 powder. PMID:26162092

  16. Hydroprocessing of Jatropha Oil for Production of Green Diesel over Non-sulfided Ni-PTA/Al2O3 Catalyst

    NASA Astrophysics Data System (ADS)

    Liu, Jing; Lei, Jiandu; He, Jing; Deng, Lihong; Wang, Luying; Fan, Kai; Rong, Long

    2015-07-01

    The non-sulfided Ni-PTA/Al2O3 catalyst was developed to produce green diesel from the hydroprocessing of Jatropha oil. The Ni-PTA/Al2O3 catalyst was prepared by one-pot synthesis of Ni/Al2O3 with the co-precipitation method and then impregnanting Ni/Al2O3 with PTA solution. The catalysts were characterized with BET, SEM-EDX, TEM, XRD, XPS, TGA and NH3-TPD. The Ni and W species of the Ni-PTA/Al2O3 catalyst were much more homogeneously distributed on the surface than that of commercial Al2O3. Catalytic performance in the hydroprocessing of Jatropha oil was evaluated by GC. The maximum conversion of Jatropha oil (98.5 wt%) and selectivity of the C15-C18 alkanes fraction (84.5 wt %) occurred at 360 °C, 3.0 MPa, 0.8 h-1. The non-sulfided Ni-PTA/Al2O3 catalyst is more environmentally friendly than the conventional sulfided hydroprocessing catalyst, and it exhibited the highest catalytic activity than the Ni-PTA catalyst supported with commercial Al2O3 grain and Al2O3 powder.

  17. Selective Crystallization Behavior of CaO-SiO2-Al2O3-MgO-FetO-P2O5 Steelmaking Slags Modified through P2O5 and Al2O3

    NASA Astrophysics Data System (ADS)

    Wang, Zhanjun; Sun, Yongqi; Sridhar, Seetharaman; Zhang, Mei; Guo, Min; Zhang, Zuotai

    2015-10-01

    In this study, the selective crystallization behavior of synthetic FetO-rich steelmaking slags modified by P2O5 and Al2O3 additions was explored using non-isothermal differential scanning calorimetry, X-ray diffraction, and field emission scanning electron microscopy techniques. Continuous cooling transformation diagrams of Fe-enriched and P-enriched phases were constructed. It was found that P2O5 addition can suppress the crystallization due to the increasing viscosity caused by increasing degree of polymerization; however, an increase of Al2O3 content accelerated the precipitation of dystectic MgFeAlO4, copolymerized by [AlO4]-tetrahedra and [FeO4]-tetrahedra units. It was also noted that the content of phosphorus in P-enriched phase can reach a high value as 28.71 wt pct for the slags modified by 15.17 wt pct Al2O3. The non-isothermal crystallization kinetics derived from activation energy and the structure of the slags explained by Raman spectra were further analyzed, which was well in accordance with the above analysis.

  18. Influence of Al2O3 on the ionic conductivity of plasticized PVC-PEG blend polymer electrolytes

    NASA Astrophysics Data System (ADS)

    Ravindran, D.; Vickraman, P.

    2016-05-01

    Polymer electrolytes with PVC-PEG blend as host matrix and LiClO4 as dopant salt was prepared through conventional solution casting method. To enhance the conductivity propylene carbonate (PC) was used as plasticizer. The influence of ceramic filler Al2O3 on the conductivity of the electrolyte films were studied by varying the (PVC: Al2O3) ratio. The films were subjected to XRD, complex impedance analysis and SEM analysis. The XRD studies reveal a marginal increase in the amorphous phase of the electrolyte films due to the incorporation of filler. The AC impedance analysis shows the dependency of ionic conductivity on the content (wt %) of filler and exhibit a maximum at 4 wt% filler. The SEM analysis depicts the occurrence of phase separation in electrolyte which is attributed to the poor solubility of polymer PVC in the liquid electrolyte.

  19. CO oxidation mechanism on the γ-Al2O3 supported single Pt atom: First principle study

    NASA Astrophysics Data System (ADS)

    Gao, Hongwei

    2016-08-01

    Understanding the role of metal-support interaction for the supported single-atom catalysts is very important in heterogeneous catalysis. Here, Three different CO oxidation mechanisms on Pt/γ-Al2O3 catalyst were probed by periodic density functional theory (DFT) calculations in detail, namely the reactive O*sbnd Osbnd C*dbnd O intermediate mechanism, the reactive CO3 intermediate mechanism and the Pt-Al3+ double sites mechanism. According to the calculated results analysis, we concluded that the dominant reaction pathway at the low temperatures is the reactive O*sbnd Osbnd C*dbnd O intermediate mechanism. Our results are in very good agreement with the experimental evidence for O*sbnd Osbnd C*dbnd O coverage on Pt/γ-Al2O3 at room temperature by an in situ diffuse reflectance infrared detector.

  20. Some Investigations on Effect of Cooling Rate on Al2O3 Reinforced Al-MMC Prepared by Vacuum Moulding

    NASA Astrophysics Data System (ADS)

    Singh, Rupinder; Sahni, Kanwalpreet

    2016-07-01

    In the present research work effort has been made to study the effect of cooling rate of Al2O3 reinforced; aluminum metal matrix composites (Al-MMC) on hardness of component prepared by vacuum moulding (VM) process. The study started with selection of the component for industrial application. This study also highlights the effect of reinforcement in form of double particle size and triple particle size on hardness of Al-Al2O3 MMC. The input parameters of process are composition of MMC, vacuum moulding silica sand AFS No., vacuum pressure and component volume. The results of study supported by microstructure analysis suggest the geometric model for MMC hardness prepared by VM process.

  1. Experimental investigation of benzoic acid diffusion coefficient in γ-Al2O3 nanofluids at different temperatures

    NASA Astrophysics Data System (ADS)

    Manouchehrian Fard, Manouchehr; Beiki, Hossein

    2015-12-01

    An experimental study was performed to measure benzoic acid diffusion coefficient in water-based γ-Al2O3 nanofluids at different temperatures. Measurements were carried out at 15, 20 and 25 °C. γ-Al2O3 nanoparticles with an average diameter of 10-20 nm were added into de-ionized water as the based fluid. Nanoparticles volume fractions used in the based fluid were 0.025, 0.05, 0.1, 0.2, 0.4 and 0.8 %. Measurements showed that the diffusion coefficients was not changed with nanoparticles concentration and no enhancement was found. Dependence of diffusion coefficients on nanoparticles concentration followed the same trend in all temperatures investigated in this work. Nano stirring and nano-obstacles could be regarded as two reasons for mass diffusivity changes