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Sample records for aln buffer layers

  1. High-quality AlN epitaxy on sapphire substrates with sputtered buffer layers

    NASA Astrophysics Data System (ADS)

    Zhang, Lisheng; Xu, Fujun; Wang, Mingxing; Sun, Yuanhao; Xie, Nan; Wang, Tao; Dong, Boyu; Qin, Zhixin; Wang, Xinqiang; Shen, Bo

    2017-05-01

    In this work, a novel strategy for high-quality AlN templates epitaxy on sapphire substrates with sputtered buffer layers combined with a low- and high-temperature alteration technique is proposed. The best full width at half maximum values for (0002) and (1 1 bar 02) reflections are 207 and 377 arcsec, respectively. Investigations indicate the joint effect of growth mode control and sputtered buffer layer results in the improvement of AlN crystalline quality. Firstly, threading dislocations density can be significantly decreased due to the alteration from three-dimensional to two-dimensional growth mode. Moreover, the graded composition of AlON layer in the sputtered buffer layer is believed to alleviate lattice mismatch between sapphire substrates and AlN, which also contributes to low dislocations density in AlN templates.

  2. Annealing of an AlN buffer layer in N2-CO for growth of a high-quality AlN film on sapphire

    NASA Astrophysics Data System (ADS)

    Miyake, Hideto; Nishio, Gou; Suzuki, Shuhei; Hiramatsu, Kazumasa; Fukuyama, Hiroyuki; Kaur, Jesbains; Kuwano, Noriyuki

    2016-02-01

    The annealing of an AlN buffer layer in a carbon-saturated N2-CO gas on a sapphire substrate was investigated. The crystal quality of the buffer layer was significantly improved by annealing at 1650-1700 °C. An AlN buffer layer with a thickness of 300 nm was grown by metalorganic vapor phase epitaxy (MOVPE), and was annealed at 1700 °C for 1 h. We fabricated a 2-µm-thick AlN layer on the annealed AlN buffer layer by MOVPE. The full widths at half maximum of the (0002)- and (10\\bar{1}2)-plane X-ray rocking curves were 16 and 154 arcsec, respectively, and the threading dislocation density was 4.7 × 108 cm-2.

  3. Microstructure of GaN epitaxy on SiC using AlN buffer layers

    SciTech Connect

    Ponce, F.A.; Krusor, B.S.; Major, J.S. Jr.; Plano, W.E.; Welch, D.F.

    1995-07-17

    The crystalline structure of GaN epilayers on (0001) SiC substrates has been studied using x-ray diffraction and transmission microscopy. The films were grown by metalorganic chemical vapor deposition, using AlN buffer layers. X-ray diffraction measurements show negligible strain in the epilayer, and a long-range variation in orientation. Transmission electron lattice images show that the AlN buffer layer consists of small crystallites. The nature of the buffer layer and its interfaces with the substrate and the GaN film is discussed. The defect structure of the GaN film away from the substrate consists mostly of threading dislocations with a density of {similar_to}10{sup 9} cm{sup {minus}2}. {copyright} {ital 1995} {ital American} {ital Institute} {ital of} {ital Physics}.

  4. GaN on Silicon Substrate with AlN Buffer Layer for UV Photodiode

    NASA Astrophysics Data System (ADS)

    Chuah, L. S.; Thahab, S. M.; Hassan, Z.

    Nitrogen plasma-assisted molecular beam epitaxy (PAMBE) deposited GaN thin films on (111) n-type silicon substrate with different thickness AlN buffer layers are investigated and distinguished by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM) and Raman scattering. The thickness of AlN buffer layer ranged from 200 nm to 300 nm. Besides that, the electrical characteristics of the GaN thin film for ultraviolet detecting utilizations are studied by calculating the photo current/dark current ratio on a metal-semiconductor-metal (MSM) photodiode with and without the illumination of Hg-lamp source. The devices have been tested over room temperature (RT). The photocurrent analysis, together with the study of Schottky barrier height (SBH) development, ascertain that the principal mechanism of photo transport is thermionic emission. The photocurrent value is rigorously dependent on Schottky barrier height. The GaN/AlN(200 nm)/n-Si MSM photodiode produces the highest photo/dark current ratio for the lowest strain that consists of the GaN film grown on the AlN (200 nm) buffer layer.

  5. Quality-enhanced AlN epitaxial films grown on c-sapphire using ZnO buffer layer for SAW applications

    NASA Astrophysics Data System (ADS)

    Fu, Sulei; Li, Qi; Gao, Shuang; Wang, Guangyue; Zeng, Fei; Pan, Feng

    2017-04-01

    AlN epitaxial films with a thin ZnO buffer layer were successfully deposited on c-sapphire by DC magnetron sputtering for surface acoustic wave (SAW) applications. The effect of ZnO buffer layer thickness on structural properties of AlN epitaxial films and the related SAW properties were investigated systematically. The results revealed that a thin ZnO buffer layer can significantly enhance the crystalline quality of AlN films and release the strain in AlN films. The AlN films were epitaxially grown on ZnO buffered-substrate with orientation relationship of (0001) [ 10 1 bar 0 ] AlN//(0001) [ 10 1 bar 0 ] ZnO//(0001) [2 bar 110 ] Al2O3. High frequency SAW devices with a center frequency of 1.4 GHz, a phase velocity of 5600 m/s were achieved on the obtained AlN films. The optimum ZnO buffer layer thickness was found to be 10 nm, resulting in high-quality epitaxial AlN films with a FWHM value of the rocking curve of 0.84°, nearly zero stress and low insertion loss of SAW devices. This work offers an effective approach to achieve high-quality AlN epitaxial films on sapphire substrates for the applications of AlN-based SAW devices.

  6. Effects of AlN buffer layer thickness on the crystallinity and surface morphology of 10-µm-thick a-plane AlN films grown on r-plane sapphire substrates

    NASA Astrophysics Data System (ADS)

    Lin, Chia-Hung; Tamaki, Shinya; Yamashita, Yasuhiro; Miyake, Hideto; Hiramatsu, Kazumasa

    2016-08-01

    10-µm-thick a-plane AlN(11\\bar{2}0) films containing a low-temperature AlN (LT-AlN) buffer layer and a high-temperature AlN (HT-AlN) film were prepared on r-plane sapphire (1\\bar{1}02) substrates. The crystallinity of all the samples with different LT-AlN buffer layer thicknesses was improved after thermal annealing and HT-AlN growth, mainly owing to the elimination of domain boundaries and the concurrent suppression of facet formation. The optimum crystallinity of HT-AlN films was obtained with full widths at half maximum of the X-ray rocking curves of 660 arcsec for AlN(11\\bar{2}0)\\parallel [1\\bar{1}00]AlN and 840 arcsec for (0002) using a 200-nm-thick LT-AlN buffer layer.

  7. A nanoporous AlN layer patterned by anodic aluminum oxide and its application as a buffer layer in a GaN-based light-emitting diode.

    PubMed

    Chen, Lung-Chien; Wang, Chih-Kai; Huang, Jenn-Bin; Hong, Lu-Sheng

    2009-02-25

    This work investigates a nanoporous aluminum nitride (AlN) layer prepared using an anodic aluminum oxide (AAO) process and its application as a buffer layer for a GaN-based light-emitting diode (LED) fabricated on sapphire substrate. Following this AAO process, the average pore spacing and pore diameter of the nanoporous AlN layer were in the ranges 180-200 nm and 100-150 nm, respectively. The light output power of the GaN-based LED with a nanoporous AlN layer was about 53% higher than that of a GaN-based LED without a nanoporous AlN layer at an injection current of 20 mA. At an injection current of 80 mA, the light output power was increased by about 34%.

  8. Reduction of threading dislocation density for AlN epilayer via a highly compressive-stressed buffer layer

    NASA Astrophysics Data System (ADS)

    Huang, Jun; Niu, Mu Tong; Zhang, Ji Cai; Wang, Wei; wang, Jian Feng; Xu, Ke

    2017-02-01

    Crystalline qualities of three AlN films grown by cold-wall high temperature hydride vapor phase epitaxy (CW-HT-HVPE) on c-plane sapphire substrates, with different AlN buffer layers (BLs) deposited either by CW-HT-HVPE or by hot-wall low temperature hydride vapor phase epitaxy (HW-LT-HVPE), have been studied. The best film quality was obtained on a 500-nm-thick AlN BL grown by HW-LT-HVPE at 1000 ℃. In this case,the AlN epilayer has the lowest full-width at half-maximum (FWHM) values of the (0002) and (10-12) x-ray rocking curve peaks of 295 and 306 arcsec, respectively, corresponding to the screw and edge threading dislocation (TD) densities of 1.9×108 cm-2 and 5.2×108 cm-2. This improvement in crystal quality of the AlN film can be attributed to the high compressive-stress of BL grown by HW-LT-HVPE,which facilitate the inclination and annihilation of TDs.

  9. Effect of AlN buffer layer properties on the morphology and polarity of GaN nanowires grown by molecular beam epitaxy

    SciTech Connect

    Brubaker, Matt D.; Rourke, Devin M.; Sanford, Norman A.; Bertness, Kris A.; Bright, Victor M.

    2011-09-01

    Low-temperature AlN buffer layers grown via plasma-assisted molecular beam epitaxy on Si (111) were found to significantly affect the subsequent growth morphology of GaN nanowires. The AlN buffer layers exhibited nanowire-like columnar protrusions, with their size, shape, and tilt determined by the AlN V/III flux ratio. GaN nanowires were frequently observed to adopt the structural characteristics of the underlying AlN columns, including the size and the degree of tilt. Piezoresponse force microscopy and polarity-sensitive etching indicate that the AlN films and the protruding columns have a mixed crystallographic polarity. Convergent beam electron diffraction indicates that GaN nanowires are Ga-polar, suggesting that Al-polar columns are nanowire nucleation sites for Ga-polar nanowires. GaN nanowires of low density could be grown on AlN buffers that were predominantly N-polar with isolated Al-polar columns, indicating a high growth rate for Ga-polar nanowires and suppressed growth of N-polar nanowires under typical growth conditions. AlN buffer layers grown under slightly N-rich conditions (V/III flux ratio = 1.0 to 1.3) were found to provide a favorable growth surface for low-density, coalescence-free nanowires.

  10. Preparation of highly c-axis oriented AlN thin films on Hastelloy tapes with Y2O3 buffer layer for flexible SAW sensor applications

    NASA Astrophysics Data System (ADS)

    Peng, Bin; Jiang, Jianying; Chen, Guo; Shu, Lin; Feng, Jie; Zhang, Wanli; Liu, Xinzhao

    2016-02-01

    Highly c-axis oriented aluminum nitrade (AlN) films were successfully deposited on flexible Hastelloy tapes by middle-frequency magnetron sputtering. The microstructure and piezoelectric properties of the AlN films were investigated. The results show that the AlN films deposited directly on the bare Hastelloy substrate have rough surface with root mean square (RMS) roughness of 32.43nm and its full width at half maximum (FWHM) of the AlN (0002) peak is 12.5∘. However, the AlN films deposited on the Hastelloy substrate with Y2O3 buffer layer show smooth surface with RMS roughness of 5.46nm and its FWHM of the AlN (0002) peak is only 3.7∘. The piezoelectric coefficient d33 of the AlN films deposited on the Y2O3/Hastelloy substrate is larger than three times that of the AlN films deposited on the bare Hastelloy substrate. The prepared highly c-axis oriented AlN films can be used to develop high-temperature flexible SAW sensors.

  11. Effect of AlN buffer layers on the structural and optoelectronic properties of InN/AlN/Sapphire heterostructures grown by MEPA-MOCVD

    NASA Astrophysics Data System (ADS)

    Indika, S. M. K.; Seidlitz, Daniel; Fali, Alireza; Cross, Brendan; Abate, Yohannes; Dietz, Nikolaus

    2016-09-01

    This contribution presents results on the structural and optoelectronic properties of InN layers grown on AlN/sapphire (0001) templates by Migration-Enhanced Plasma Assisted Metal Organic Chemical Vapor Deposition (MEPAMOCVD). The AlN nucleation layer (NL) was varied to assess the physical properties of the InN layers. For ex-situ analysis of the deposited structures, Raman spectroscopy, Atomic Force Microscopy (AFM), and Fourier Transform Infrared (FTIR) reflectance spectroscopy have been utilized. The structural and optoelectronic properties are assessed by Raman-E2 high FWHM values, surface roughness, free carrier concentrations, mobility of the free carriers, and high frequency dielectric function. This study focus on optimizing the AlN nucleation layer (e.g. temporal precursor exposure, nitrogen plasma exposure, plasma power and AlN buffer growth temperature) and its effect on the InN layer properties.

  12. Anisotropic structural and optical properties of semi-polar (11–22) GaN grown on m-plane sapphire using double AlN buffer layers

    PubMed Central

    Zhao, Guijuan; Wang, Lianshan; Yang, Shaoyan; Li, Huijie; Wei, Hongyuan; Han, Dongyue; Wang, Zhanguo

    2016-01-01

    We report the anisotropic structural and optical properties of semi-polar (11–22) GaN grown on m-plane sapphire using a three-step growth method which consisted of a low temperature AlN buffer layer, followed by a high temperature AlN buffer layer and GaN growth. By introducing double AlN buffer layers, we substantially improve the crystal and optical qualities of semi-polar (11–22) GaN, and significantly reduce the density of stacking faults and dislocations. The high resolution x-ray diffraction measurement revealed that the in-plane anisotropic structural characteristics of GaN layer are azimuthal dependent. Transmission electron microscopy analysis showed that the majority of dislocations in the GaN epitaxial layer grown on m-sapphire are the mixed-type and the orientation of GaN layer was rotated 58.4° against the substrate. The room temperature photoluminescence (PL) spectra showed the PL intensity and wavelength have polarization dependence along parallel and perpendicular to the [1–100] axis (polarization degrees ~ 0.63). The realization of a high polarization semi-polar GaN would be useful to achieve III-nitride based lighting emission device for displays and backlighting. PMID:26861595

  13. RF-MBE growth of cubic AlN on MgO (001) substrates via 2-step c-GaN buffer layer

    NASA Astrophysics Data System (ADS)

    Kakuda, M.; Morikawa, S.; Kuboya, S.; Katayama, R.; Yaguchi, H.; Onabe, K.

    2013-09-01

    We fabricated cubic AlN (c-AlN) films on MgO (001) substrates via 2-step c-GaN buffer layer by radio-frequency-plasma-assisted molecular beam epitaxy (RF-MBE). The effect of low temperature c-GaN buffer layer on the surface flatness and crystal quality of c-AlN was investigated by AFM and XRD reciprocal space mapping analysis. We examined optical properties of the c-AlN film by spectroscopic ellipsometry. The absorption edge by the direct transition of the c-AlN film was 5.95 eV caused by the hexagonal phase incorporation.

  14. Fabrication of high-crystallinity a-plane AlN films grown on r-plane sapphire substrates by modulating buffer-layer growth temperature and thermal annealing conditions

    NASA Astrophysics Data System (ADS)

    Lin, Chia-Hung; Yamashita, Yasuhiro; Miyake, Hideto; Hiramatsu, Kazumasa

    2017-06-01

    High-crystallinity a-plane AlN(11 2 ̅0) films containing a low-temperature AlN (LT-AlN) buffer layer and a high-temperature AlN (HT-AlN) film were grown on r-plane sapphire(1 1 ̅02) substrates. We investigated the effect of the growth temperature and thermal annealing conditions for the LT-AlN buffer layers on the crystallinity and surface morphology. The surface roughness of the buffer layers became smooth with the decrease in growth temperature to 900 °C, and the crystallinity of the buffer layers was improved by thermal annealing at temperatures over 1600 °C. HT-AlN films were then grown on the annealed LT-AlN buffer layers at 1500 °C. The optimum crystallinity of HT-AlN films without any facet formation at the surfaces was obtained with full width at half maximum values of the X-ray rocking curves for AlN(11 2 ̅0)//[1 1 ̅00]AlN at 770 and (0002) at 640″.

  15. Orientation-controlled epitaxial lateral overgrowth of semipolar GaN on Si(001) with a directionally sputtered AlN buffer layer

    NASA Astrophysics Data System (ADS)

    Lee, Ho-Jun; Bae, Si-Young; Lekhal, Kaddour; Tamura, Akira; Suzuki, Takafumi; Kushimoto, Maki; Honda, Yoshio; Amano, Hiroshi

    2017-06-01

    We successfully grew semipolar (10 1 ̅ 3) and (10 1 ̅ 5) GaN films on Si(001) substrates employing metal-organic chemical vapor deposition (MOCVD) by inserting a directionally sputtered AlN (DS-AlN) buffer layer. To improve the crystal quality of the orientation-controlled semipolar (10 1 ̅ 3) and (10 1 ̅ 5) GaN films, a two-step epitaxial lateral overgrowth (ELO) process was performed with a striped mask. According to low-temperature cathodoluminescence (LT-CL) characterization, the ELO results in a coalesced morphology and a low defect density of <2.72×108 cm-2 for both semipolar (10 1 ̅ 3) and (10 1 ̅ 5) GaN films. For comparing the properties of planar and ELO semipolar GaN, a rocking curve of x-ray diffraction (XRD) and low-temperature photoluminescence (LT-PL) spectra was measured. The crystal orientation of semipolar GaN films was confirmed using electron backscatter diffraction (EBSD).

  16. Single crystalline AlN film formed by direct nitridation of sapphire using aluminum oxynitride buffer

    NASA Astrophysics Data System (ADS)

    Nakao, Wataru; Fukuyama, Hiroyuki

    2003-12-01

    A noble method forming single crystalline AlN films has been developed as a new substrate for blue/UV light emitters. Sapphire substrates have been nitrided by appropriate CO-N 2 gas mixtures saturated with graphite based on the chemical potential diagram of the Al-N-O-C system. The nitrided surface of sapphire consists of consecutive layers of AlN and γ-aluminum oxynitride (γ-ALON) with low-level dislocation density, where the γ-ALON layer spontaneously forms as an equilibrium phase and acts as a buffer. The lattice mismatch between sapphire substrate and AlN layer has been effectively reduced by using the γ-ALON buffer, which significantly attributes to the growth of single crystalline AlN.

  17. Mechanism for persistent hexagonal island formation in AlN buffer layer during growth on Si (111) by plasma-assisted molecular beam epitaxy

    SciTech Connect

    Hsu, K.-Y.; Chung, H.-C.; Liu, C.-P.; Tu, L.-W.

    2007-05-21

    The characteristics of structure and morphology of AlN grown by a growth interruption method on Si (111) with plasma-assisted molecular beam epitaxy are investigated. It is found that the growth interruption method would improve the surface flatness of the AlN layer without the formation of Al droplets. However, AlN hexagonal islands were present and persistent throughout the entire growth owing to effective strain relaxation and Eherlich-Schowebel barrier effect of preexistent surface islands grown on higher terraces of the Si substrate. The density of threading dislocations underneath the hexagonal islands is much less than elsewhere in the film, which is presumably due to dislocation annihilation during the island growth process.

  18. Nitrogen-Polar (0001¯) GaN Grown on c-Plane Sapphire with a High-Temperature AlN Buffer

    PubMed Central

    Song, Jie; Han, Jung

    2017-01-01

    We demonstrate growing nitrogen-polar (N-polar) GaN epilayer on c-plane sapphire using a thin AlN buffer layer by metalorganic chemical vapor deposition. We have studied the influence of the AlN buffer layer on the polarity, crystalline quality, and surface morphology of the GaN epilayer and found that the growth temperature of the AlN buffer layer played a critical role in the growth of the GaN epilayer. The low growth temperature of the AlN buffer results in gallium-polar GaN. Even a nitridation process has been conducted. High growth temperature for an AlN buffer layer is required to achieve pure N-polarity, high crystalline quality, and smooth surface morphology for a GaN epilayer. PMID:28772612

  19. Self-organization of dislocation-free, high-density, vertically aligned GaN nanocolumns involving InGaN quantum wells on graphene/SiO2 covered with a thin AlN buffer layer.

    PubMed

    Hayashi, Hiroaki; Konno, Yuta; Kishino, Katsumi

    2016-02-05

    We demonstrated the self-organization of high-density GaN nanocolumns on multilayer graphene (MLG)/SiO2 covered with a thin AlN buffer layer by RF-plasma-assisted molecular beam epitaxy. MLG/SiO2 substrates were prepared by the transfer of CVD graphene onto thermally oxidized SiO2/Si [100] substrates. Employing the MLG with an AlN buffer layer enabled the self-organization of high-density and vertically aligned nanocolumns. Transmission electron microscopy observation revealed that no threading dislocations, stacking faults, or twinning defects were included in the self-organized nanocolumns. The photoluminescence (PL) peak intensities of the self-organized GaN nanocolumns were 2.0-2.6 times higher than those of a GaN substrate grown by hydride vapor phase epitaxy. Moreover, no yellow luminescence or ZB-phase GaN emission was observed from the nanocolumns. An InGaN/GaN MQW and p-type GaN were integrated into GaN nanocolumns grown on MLG, displaying a single-peak PL emission at a wavelength of 533 nm. Thus, high-density nitride p-i-n nanocolumns were fabricated on SiO2/Si using the transferred MLG interlayer, indicating the possibility of developing visible nanocolumn LEDs on graphene/SiO2.

  20. AlN antiresonant layer ARROW waveguides

    NASA Astrophysics Data System (ADS)

    Pelegrini, M. V.; Carvalho, D. O.; Alayo, M. I.; Pereyra, I.

    2010-02-01

    Aluminum Nitride (AlN) is a wide band gap III-V semiconductor material often used for optical applications due to its transparency and high refractive index. We have produced and characterized AlN thin films by reactive r.f. magnetron sputtering in different Ar-N2 atmospheres in order to verify the best gaseous concentration to be utilized as anti-resonant layer in ARROW waveguides. The corresponding films were characterized by Fourier transform infrared spectroscopy (FTIR), Rutherford backscattering spectroscopy (RBS), Ellipsometry and visible optical absorption. The AlN properties did not varied significantly between the films deposited with 20 and 70 sccm of N2, most of the variations occurred for films deposited with 18 sccm of N2 or below. The film deposited with 20 sccm was selected to be used as the first ARROW layer in the fabricated waveguides. Two routines were used to design the waveguides parameters, the transfer matrix method (TMM) and the semi-vectorial non-uniform finite difference method (NU-FDM). Attenuation as low as 3.5dB/cm was obtained for a 7 μm wide waveguide.

  1. Methods for improved growth of group III nitride buffer layers

    DOEpatents

    Melnik, Yurity; Chen, Lu; Kojiri, Hidehiro

    2014-07-15

    Methods are disclosed for growing high crystal quality group III-nitride epitaxial layers with advanced multiple buffer layer techniques. In an embodiment, a method includes forming group III-nitride buffer layers that contain aluminum on suitable substrate in a processing chamber of a hydride vapor phase epitaxy processing system. A hydrogen halide or halogen gas is flowing into the growth zone during deposition of buffer layers to suppress homogeneous particle formation. Some combinations of low temperature buffers that contain aluminum (e.g., AlN, AlGaN) and high temperature buffers that contain aluminum (e.g., AlN, AlGaN) may be used to improve crystal quality and morphology of subsequently grown group III-nitride epitaxial layers. The buffer may be deposited on the substrate, or on the surface of another buffer. The additional buffer layers may be added as interlayers in group III-nitride layers (e.g., GaN, AlGaN, AlN).

  2. Investigation of void formation beneath thin AlN layers by decomposition of sapphire substrates for self-separation of thick AlN layers grown by HVPE

    NASA Astrophysics Data System (ADS)

    Kumagai, Yoshinao; Enatsu, Yuuki; Ishizuki, Masanari; Kubota, Yuki; Tajima, Jumpei; Nagashima, Toru; Murakami, Hisashi; Takada, Kazuya; Koukitu, Akinori

    2010-09-01

    Void formation at the interface between thick AlN layers and (0 0 0 1) sapphire substrates was investigated to form a predefined separation point of the thick AlN layers for the preparation of freestanding AlN substrates by hydride vapor phase epitaxy (HVPE). By heating 50-200 nm thick intermediate AlN layers above 1400 °C in a gas flow containing H 2 and NH 3, voids were formed beneath the AlN layers by the decomposition reaction of sapphire with hydrogen diffusing to the interface. The volume of the sapphire decomposed at the interface increased as the temperature and time of the heat treatment was increased and as the thickness of the AlN layer decreased. Thick AlN layers subsequently grown at 1450 °C after the formation of voids beneath the intermediate AlN layer with a thickness of 100 nm or above self-separated from the sapphire substrates during post-growth cooling with the aid of voids. The 79 μm thick freestanding AlN substrate obtained using a 200 nm thick intermediate AlN layer had a flat surface with no pits, high optical transparency at wavelengths above 208.1 nm, and a dislocation density of 1.5×10 8 cm -2.

  3. Undoped Buffer Layer Development.

    DTIC Science & Technology

    1984-01-01

    boiled for several hours in aqua regia , followed by boiling for several more hours in deionized water before being dried in air and loaded into the...different from Report) 1S. SUPPLEMENTARY NOTES it. IKy WORDS (Canal... an reverse 4aaIo It eesarav d Ientify by block nuinbr) Epitaxial layer MBE

  4. Doped LZO buffer layers for laminated conductors

    DOEpatents

    Paranthaman, Mariappan Parans [Knoxville, TN; Schoop, Urs [Westborough, MA; Goyal, Amit [Knoxville, TN; Thieme, Cornelis Leo Hans [Westborough, MA; Verebelyi, Darren T [Oxford, MA; Rupich, Martin W [Framingham, MA

    2010-03-23

    A laminated conductor includes a metallic substrate having a surface, a biaxially textured buffer layer supported by the surface of the substrate, the biaxially textured buffer layer comprising LZO and a dopant for mitigating metal diffusion through the LZO, and a biaxially textured conductor layer supported by the biaxially textured buffer layer.

  5. Silicon induced defect reduction in AlN template layers for epitaxial lateral overgrowth

    NASA Astrophysics Data System (ADS)

    Mogilatenko, A.; Knauer, A.; Zeimer, U.; Hartmann, C.; Oppermann, H.; Weyers, M.

    2017-03-01

    The effect of Si doping on defect density in AlN layers grown on sapphire was analysed. Si concentration in the range of 1019 cm-3 leads to dislocation line inclination in AlN layers with a threading dislocation density of 3×1010 cm-2. Overgrowth of Si doped AlN layers by non-intentionally doped AlN results in a reduction of threading dislocation density by a factor of two. In contrast, an increase of the Si concentration to an order of 1020 cm-3 leads to a structural degradation of the AlN layers. The degradation process takes place through transformation to columnar-like growth. In a second experiment the AlN/AlN:Si/AlN layers with a decreased defect density were trench-patterned and used for subsequent epitaxial lateral overgrowth. In comparison to the epitaxial lateral overgrowth of non-intentionally doped AlN templates, the use of the AlN templates containing an AlN:Si interlayer allows to reduce the threading dislocation density in the defect-rich regions above the ridges in 6 μm thick epitaxial laterally overgrown AlN by a factor of 2.5.

  6. New buffer layers for GaN on sapphire by atomic layer and molecular stream epitaxy

    SciTech Connect

    Piner, E.L.; He, Y.W.; Boutros, K.S.; McIntosh, F.G.; Roberts, J.C.; Bedair, S.M.; El-Masry, N.A.

    1996-11-01

    The current approach of depositing a low temperature then annealed AlN or GaN buffer for the growth of GaN on sapphire results in a high dislocation density. These dislocations thread through the GaN layer to the surface. Reducing their density either by growing thicker films or using a strained layer superlattice is ineffective. Two new approaches for AlN/GaN buffer layer growth for GaN on sapphire have been employed: Atomic Layer Epitaxy (ALE) and molecular Stream Epitaxy (MSE). ALE is distinguished by organo-metallic/ammonia separation while MSE is distinguished by cyclic annealing of the growing film. Both ALE and MSE enhance two dimensional growth of single crystal GaN on sapphire. The structural quality of epitaxial GaN grown on these buffer layers was studied by transmission electron microscopy (TEM) and x-ray diffraction (XRD). The initial result for the ALE buffer shows an improved quality GaN film with lower defect densities. The MSE grown buffer layer closely resembles that of conventionally grown MOCVD buffer layers observed by others, with dislocations threading through the GaN epilayer. The effects of these buffer layers on the structural and optical properties of GaN grown on sapphire will be presented.

  7. Effects of AlN Coating Layer on High Temperature Characteristics of Langasite SAW Sensors

    PubMed Central

    Shu, Lin; Peng, Bin; Cui, Yilin; Gong, Dongdong; Yang, Zhengbing; Liu, Xingzhao; Zhang, Wanli

    2016-01-01

    High temperature characteristics of langasite surface acoustic wave (SAW) devices coated with an AlN thin film have been investigated in this work. The AlN films were deposited on the prepared SAW devices by mid-frequency magnetron sputtering. The SAW devices coated with AlN films were measured from room temperature to 600 °C. The results show that the SAW devices can work up to 600 °C. The AlN coating layer can protect and improve the performance of the SAW devices at high temperature. The SAW velocity increases with increasing AlN coating layer thickness. The temperature coefficients of frequency (TCF) of the prepared SAW devices decrease with increasing thickness of AlN coating layers, while the electromechanical coupling coefficient (K2) of the SAW devices increases with increasing AlN film thickness. The K2 of the SAW devices increases by about 20% from room temperature to 600 °C. The results suggest that AlN coating layer can not only protect the SAW devices from environmental contamination, but also improve the K2 of the SAW devices. PMID:27608027

  8. Dynamic measurements of actuators driven by AlN layers

    NASA Astrophysics Data System (ADS)

    Kacperski, Jacek; Kujawinska, Malgorzata; Leon, Sergio Camacho; Nieradko, Lukasz; Jozwik, Michal; Gorecki, Christophe

    2005-09-01

    Micro-Electro-Mechanical Systems are nowadays frequently used in many fields of industry. The number of their applications increase and their functions became more complex and demanding. Therefore precise knowledge about their static (shape, deformations, stresses) and dynamic (resonance frequencies, amplitude and phase of vibration) properties is necessary. Two beam laser interferometry is one of the most popular testing methods of micromechanical elements as a non-contact, high-accurate method allowing full-field measurement. First part of the paper present microbeam actuators designed for MEMS/MOEMS applications. The proposed structures are the straight silicon microbeams formed by KOH etching of Si wafer. Aluminium nitride (AlN) thin films are promising materials for many acoustic and optic applications in MEMS field. In the proposed architecture the actuation layer is sandwiched between two metal electrodes on the top of beam. In the second part we describe the methodology of the actuator characterization. These methods applied are: stroboscopic interferometry and active interferometry (LCOS SLM is used as a reference surface in Twyman-Green interferometer). Moreover some results of FEM analysis of the sample are shown and compared with experimental results. Dynamic measurements validate the design and simulations, and provide information for optimization of the actuator manufacturing process.

  9. Effects of AlN nucleation layer thickness on crystal quality of AlN grown by plasma-assisted molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Ren, Fan; Hao, Zhi-Biao; Hu, Jian-Nan; Zhang, Chen; Luo, Yi

    2010-11-01

    In this paper, the effects of thickness of AlN nucleation layer grown at high temperature on AlN epi-layer crystalline quality are investigated. Crack-free AlN samples with various nucleation thicknesses are grown on sapphire substrates by plasma-assisted molecular beam epitaxy. The AlN crystalline quality is analysed by transmission electron microscope and x-ray diffraction (XRD) rocking curves in both (002) and (102) planes. The surface profiles of nucleation layer with different thicknesses after in-situ annealing are also analysed by atomic force microscope. A critical nucleation thickness for realising high quality AlN films is found. When the nucleation thickness is above a certain value, the (102) XRD full width at half maximum (FWHM) of AlN bulk increases with nucleation thickness increasing, whereas the (002) XRD FWHM shows an opposite trend. These phenomena can be attributed to the characteristics of nucleation islands and the evolution of crystal grains during AlN main layer growth.

  10. Thermodynamic aspects of carbon incorporation into AlN epitaxial layers grown by MOVPE

    NASA Astrophysics Data System (ADS)

    Leitner, J.; Stejskal, J.; Sofer, Z.

    2005-05-01

    Thermodynamic aspects of carbon incorporation into AlN during the MOVPE growth are discussed. Under low potential in the gaseous phase, carbon dissolves in AlN substituting nitrogen atoms. A sublattice model has been proposed to describe the thermodynamic behavior of this pseudobinary solution AlN-C. When carbon potential increases, solid graphite is formed simultaneously to AlN. At V/III input ratio (V/III = x/x) lower than one, carbonitride Al5C3N as well carbide Al4C3 can be formed. The calculated results are compared with the composition of AlN layers growth by MOVPE. The serious discrepancies exist which can be explained by the crude nature of the solution model as well as by non-equilibrium conditions during the MOVPE growth and subsequent carbon supersaturation of the resulting layers.

  11. Buffer layer for thin film structures

    DOEpatents

    Foltyn, Stephen R.; Jia, Quanxi; Arendt, Paul N.; Wang, Haiyan

    2010-06-15

    A composite structure including a base substrate and a layer of a mixture of strontium titanate and strontium ruthenate is provided. A superconducting article can include a composite structure including an outermost layer of magnesium oxide, a buffer layer of strontium titanate or a mixture of strontium titanate and strontium ruthenate and a top-layer of a superconducting material such as YBCO upon the buffer layer.

  12. Buffer layer for thin film structures

    DOEpatents

    Foltyn, Stephen R.; Jia, Quanxi; Arendt, Paul N.; Wang, Haiyan

    2006-10-31

    A composite structure including a base substrate and a layer of a mixture of strontium titanate and strontium ruthenate is provided. A superconducting article can include a composite structure including an outermost layer of magnesium oxide, a buffer layer of strontium titanate or a mixture of strontium titanate and strontium ruthenate and a top-layer of a superconducting material such as YBCO upon the buffer layer.

  13. Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy

    SciTech Connect

    Nepal, N.; Qadri, S. B.; Hite, J. K.; Mahadik, N. A.; Mastro, M. A.; Eddy, C. R. Jr.

    2013-08-19

    Thin AlN layers were grown at 200–650 °C by plasma assisted atomic layer epitaxy (PA-ALE) simultaneously on Si(111), sapphire (1120), and GaN/sapphire substrates. The AlN growth on Si(111) is self-limited for trimethyaluminum (TMA) pulse of length > 0.04 s, using a 10 s purge. However, the AlN nucleation on GaN/sapphire is non-uniform and has a bimodal island size distribution for TMA pulse of ≤0.03 s. The growth rate (GR) remains almost constant for T{sub g} between 300 and 400 °C indicating ALE mode at those temperatures. The GR is increased by 20% at T{sub g} = 500 °C. Spectroscopic ellipsometry (SE) measurement shows that the ALE AlN layers grown at T{sub g} ≤ 400 °C have no clear band edge related features, however, the theoretically estimated band gap of 6.2 eV was measured for AlN grown at T{sub g} ≥ 500 °C. X-ray diffraction measurements on 37 nm thick AlN films grown at optimized growth conditions (T{sub g} = 500 °C, 10 s purge, 0.06 s TMA pulse) reveal that the ALE AlN on GaN/sapphire is (0002) oriented with rocking curve full width at the half maximum (FWHM) of 670 arc sec. Epitaxial growth of crystalline AlN layers by PA-ALE at low temperatures broadens application of the material in the technologies that require large area conformal growth at low temperatures with thickness control at the atomic scale.

  14. Magnetic behavior of CoPt-AlN granular structure laminated with AlN layers

    NASA Astrophysics Data System (ADS)

    Yu, Youxing; Shi, Ji; Nakamura, Yoshio

    2011-04-01

    The magnetic behavior of CoPt-AlN granular structure laminated with AlN layers has been studied. Ultrathin multilayer structure, [CoPt0.5 nm/AlN0.5nm]4, is used as the precursor of the magnetic layers, which are separated by 5-nm-thick AlN layers. Upon thermal annealing, the ultrathin multilayer transforms into CoPt-AlN granular structure, and the thick AlN layers remain to be spacers. When the film was annealed at 400 °C, the out-of-plane direction becomes the easy axis of magnetization, although the coercivity remains small. TEM observation has proved that CoPt shows disklike shape at such an annealing temperature. When increasing the annealing temperature to 600 °C and above, the films show "isotropic" magnetic behavior due to the formation of equiaxial CoPt particles in the magnetic layers.

  15. High Quality Transferable AlN Thin Film by PLD

    NASA Astrophysics Data System (ADS)

    Li, Heng; Lu, Xiaoli; Li, Xin; Zhang, JinCheng; Hao, Yue

    2017-06-01

    AlN thin film was epitaxial grown on c-plane sapphire substrate by pulsed laser deposition. To reduce structural defects from largely lattice mismatched substrate, MgO or ZnO buffer layer was inserted between AlN and sapphire. Crystal structure and surface morphology of as prepared AlN were characterized by XRD, AFM, and SEM. It was found that buffer layers significantly improve crystalline quality of AlN, especially using ZnO. Furthermore, a general and steady wet chemical process was developed to selectively etch away ZnO layer, so that high quality free-standing AlN thin film was obtained. This film could be transferred onto any other host substrates such as Si, quartz, etc. Moreover, with no clamping effect from the substrate, the as-prepared free-standing AlN thin films may find potential applications in high sensitivity piezoelectric devices, flexible wearable detectors and so on.

  16. Growth and optical properties of AlN homoepitaxial layers grown by ammonia-source molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Iwata, Shiro; Nanjo, Yoshiyuki; Okuno, Toshihiro; Kurai, Satoshi; Taguchi, Tsunemasa

    2007-04-01

    We have performed the homoepitaxial growth of high-crystalline quality Aluminium nitride (AlN) epilayers by the ammonia-gas source (GS) molecular-beam epitaxy method using the hydride vapor-phase epitaxy (HVPE) grown AlN thin layers as substrates. Surface morphologies and step-bunching structures of the homoepitaxially grown AlN epilayers were evaluated using in situ reflection high-energy electron diffraction (RHEED) patterns and scanning probe microscopy. It is noted that the step height of several monolayers was achieved on the surface of homoepitaxial layers. The homoepitaxial AlN thin films had the same or improved crystalline quality compared with the HVPE-grown AlN layers from X-ray rocking curve measurements, and its optical properties were investigated using cathodoluminescence measurements. Excitonic emission, which originates from the A free-exciton transition, was clearly observed in the present high-quality homoepitaxial AlN epilayers.

  17. Crystalline growth of AlN thin films by atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Sadeghpour, S.; Ceyssens, F.; Puers, R.

    2016-10-01

    Aluminum nitride (AlN) thin film was grown by plasma enhanced atomic layer deposition using trimethylaluminum and ammonia precursors. A method was found to have crystalline thin film AlN with almost zero thickness variation and a truly one layer deposition of atoms per each cycle of the process. The growth rate saturated at ∼ 1 Å/cycle, and the thickness was proportional to the number of reaction cycles. The preferred crystal orientation, uniformity of the nucleation and the surface roughness of the grown AlN were investigated. X-ray diffraction (XRD), atomic focused microscopy (AFM) and scanning electron microscopy (SEM) were carried out to analyze the crystallinity and properties of the films.

  18. Comparison of ammonia plasma and AlN passivation by plasma-enhanced atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Mattila, P.; Bosund, M.; Huhtio, T.; Lipsanen, H.; Sopanen, M.

    2012-03-01

    Surface passivation of GaAs by ammonia plasma and AlN fabricated by plasma-enhanced atomic layer deposition are compared. It is shown that the deposition temperature can be reduced to 150 °C and effective passivation is still achieved. Samples passivated by AlN fabricated at 150 °C show four times higher photoluminescence intensity and longer time-resolved photoluminescence lifetime than ammonia plasma passivated samples. The passivation effect is shown to last for months. The dependence of charge carrier lifetime and integrated photoluminescence intensity on AlN layer thickness is studied using an exponential model to describe the tunneling probability from the near-surface quantum well to the GaAs surface.

  19. Improvement of OLED properties with the AlN insulated layer

    NASA Astrophysics Data System (ADS)

    Liu, Chunling; Wang, Jin; Wang, Chunwu; Zhao, Lei; Jiang, Wenlong

    2010-11-01

    The thin aluminum nitride(AlN) film using as an insulating layer was inserted between the anode (ITO) and the NPB organic film in the organic light-emitting devices(OLED) for the structure being K9/ITO/AlN/NPB/Alq3/LiF/Al.The effect of the different thickness AlN film on the device performance was investigated. After optimization, improvement of OLEDs properties is biggest when the AlN film thickness is about 0.4nm.Such a structure with AlN layer facilitates the increase of current density and decrease of threshold voltage, resulting in an improved luminance and energy efficiency. The average luminance increased by about 30% and an improvement of 21.8% on the average current density. The lifetime experiment of the devices has proved an improvement on stability because of inserted AlN film. This phenomenon is mainly because of the insulating capability of the aluminum nitride coating and the passivation role of AlN film to the ITO surface. The processing is simple and high efficient, can be widely applied to the OLED devices.

  20. Interface roughness of double buffer layer of GaN film grown on Si(1 1 1) substrate using GIXR analysis

    NASA Astrophysics Data System (ADS)

    Yamamoto, Y.; Yamabe, N.; Ohachi, T.

    2011-03-01

    A double buffer layer (DBL), interface reaction epitaxy (IRE) AlN/β-Si3N4/Si, grown by an IRE of β-Si3N4 and AlN films on Si, was fabricated to improve the crystalline quality of successively grown 30 nm GaN on a 30 nm AlN buffer layer using plasma-assisted molecular beam epitaxy (PA-MBE). The DBL was first prepared by surface nitridation of Si and successively prepared by IRE between the deposited Al and N atoms in β-Si3N4. Both the AlN buffer layer on the DBL and GaN film on the AlN buffer layer were grown by activity-modulation migration enhanced epitaxy (AM-MEE). Hetero epitaxial grown films of GaN(30 nm)/AlN buffer(30 nm)/DBL/Si(1 1 1) were prepared for analysis using a three layer model of grazing incidence-angle X-ray reflectivity (GIXR), which consisted of three layers of GaN, AlN buffer and Si and of the three interfaces of the GaN surface, GaN/AlN buffer and AlN buffer/DBL/Si. The nitridation temperature dependence of the interface roughness of the DBL was measured to be 0.5 and 0.6 nm, for nitridation temperatures of 780 and 830 °C, respectively. The full width at half maximum (FWHM) of rocking curve GaN(0 0 0 2) measured by X-ray diffraction (XRD) for nitridation temperatures of 780 and 830 °C were 58.2 and 55.2 arcmin, respectively.

  1. Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing

    PubMed Central

    Shih, Huan-Yu; Lee, Wei-Hao; Kao, Wei-Chung; Chuang, Yung-Chuan; Lin, Ray-Ming; Lin, Hsin-Chih; Shiojiri, Makoto; Chen, Miin-Jang

    2017-01-01

    Low-temperature epitaxial growth of AlN ultrathin films was realized by atomic layer deposition (ALD) together with the layer-by-layer, in-situ atomic layer annealing (ALA), instead of a high growth temperature which is needed in conventional epitaxial growth techniques. By applying the ALA with the Ar plasma treatment in each ALD cycle, the AlN thin film was converted dramatically from the amorphous phase to a single-crystalline epitaxial layer, at a low deposition temperature of 300 °C. The energy transferred from plasma not only provides the crystallization energy but also enhances the migration of adatoms and the removal of ligands, which significantly improve the crystallinity of the epitaxial layer. The X-ray diffraction reveals that the full width at half-maximum of the AlN (0002) rocking curve is only 144 arcsec in the AlN ultrathin epilayer with a thickness of only a few tens of nm. The high-resolution transmission electron microscopy also indicates the high-quality single-crystal hexagonal phase of the AlN epitaxial layer on the sapphire substrate. The result opens a window for further extension of the ALD applications from amorphous thin films to the high-quality low-temperature atomic layer epitaxy, which can be exploited in a variety of fields and applications in the near future. PMID:28045075

  2. Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing

    NASA Astrophysics Data System (ADS)

    Shih, Huan-Yu; Lee, Wei-Hao; Kao, Wei-Chung; Chuang, Yung-Chuan; Lin, Ray-Ming; Lin, Hsin-Chih; Shiojiri, Makoto; Chen, Miin-Jang

    2017-01-01

    Low-temperature epitaxial growth of AlN ultrathin films was realized by atomic layer deposition (ALD) together with the layer-by-layer, in-situ atomic layer annealing (ALA), instead of a high growth temperature which is needed in conventional epitaxial growth techniques. By applying the ALA with the Ar plasma treatment in each ALD cycle, the AlN thin film was converted dramatically from the amorphous phase to a single-crystalline epitaxial layer, at a low deposition temperature of 300 °C. The energy transferred from plasma not only provides the crystallization energy but also enhances the migration of adatoms and the removal of ligands, which significantly improve the crystallinity of the epitaxial layer. The X-ray diffraction reveals that the full width at half-maximum of the AlN (0002) rocking curve is only 144 arcsec in the AlN ultrathin epilayer with a thickness of only a few tens of nm. The high-resolution transmission electron microscopy also indicates the high-quality single-crystal hexagonal phase of the AlN epitaxial layer on the sapphire substrate. The result opens a window for further extension of the ALD applications from amorphous thin films to the high-quality low-temperature atomic layer epitaxy, which can be exploited in a variety of fields and applications in the near future.

  3. Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing.

    PubMed

    Shih, Huan-Yu; Lee, Wei-Hao; Kao, Wei-Chung; Chuang, Yung-Chuan; Lin, Ray-Ming; Lin, Hsin-Chih; Shiojiri, Makoto; Chen, Miin-Jang

    2017-01-03

    Low-temperature epitaxial growth of AlN ultrathin films was realized by atomic layer deposition (ALD) together with the layer-by-layer, in-situ atomic layer annealing (ALA), instead of a high growth temperature which is needed in conventional epitaxial growth techniques. By applying the ALA with the Ar plasma treatment in each ALD cycle, the AlN thin film was converted dramatically from the amorphous phase to a single-crystalline epitaxial layer, at a low deposition temperature of 300 °C. The energy transferred from plasma not only provides the crystallization energy but also enhances the migration of adatoms and the removal of ligands, which significantly improve the crystallinity of the epitaxial layer. The X-ray diffraction reveals that the full width at half-maximum of the AlN (0002) rocking curve is only 144 arcsec in the AlN ultrathin epilayer with a thickness of only a few tens of nm. The high-resolution transmission electron microscopy also indicates the high-quality single-crystal hexagonal phase of the AlN epitaxial layer on the sapphire substrate. The result opens a window for further extension of the ALD applications from amorphous thin films to the high-quality low-temperature atomic layer epitaxy, which can be exploited in a variety of fields and applications in the near future.

  4. Formation of hexagonal AlN nanotowers and layered nanorods by direct nitridation of aluminum

    NASA Astrophysics Data System (ADS)

    Zhang, P. G.; Wang, K. Y.; Liang, Jiandong; Guo, S. M.

    2011-02-01

    Hexagonal AlN nanotowers and layered nanorods with a diameter of hundreds of nanometers and a length of several microns have been successfully synthesized by direct nitridation of aluminum and rice bran mixture compacts in a tube furnace up to 1250 °C under a flow of nitrogen without the addition of extra catalyst. The structure of the nano-AlN products was characterized by XRD and SEM. XRD pattern indicates that the conversion of Al into AlN is complete. The formation of the nanostructures is primarily due to the existence of rich trace elements in the rice bran. The importance of these trace elements and the formation of AlN nanotowers/nanorods have been discussed with the VLS/VS growth mechanisms. The unique morphology of the as-synthesized nanotowers could be useful for investigating fundamental physical phenomena and for fabricating nanodevices.

  5. Semipolar AlN and GaN on Si(100): HVPE technology and layer properties

    NASA Astrophysics Data System (ADS)

    Bessolov, V.; Kalmykov, A.; Konenkova, E.; Kukushkin, S.; Myasoedov, A.; Poletaev, N.; Rodin, S.

    2017-01-01

    Hydride vapor phase epitaxy (HVPE) growth of semipolar AlN and GaN layers on planar Si(100) substrates with SiC nanolayer is investigated. It is shown experimentally that the solid-phase epitaxial formation of a specially oriented SiC nucleation layer followed by epitaxy of AlN layer by HVPE at low rates enables growth of aluminum and gallium nitrides in the semipolar direction. For the best GaN(20-23) layers obtained, the full width at half maximum (FWHM) value for the x-ray diffraction rocking curve is 24 arcmin. The photoluminescence spectrum of the semipolar GaN measured at 4 K exhibits bands related to basal-plane and prismatic stacking faults (BSF and PSF).

  6. Improved performance of GaN based light emitting diodes with ex-situ sputtered AlN nucleation layers

    SciTech Connect

    Chen, Shuo-Wei; Li, Heng; Lu, Tien-Chang

    2016-04-15

    The crystal quality, electrical and optical properties of GaN based light emitting diodes (LEDs) with ex-situ sputtered physical vapor deposition (PVD) aluminum nitride (AlN) nucleation layers were investigated. It was found that the crystal quality in terms of defect density and x-ray diffraction linewidth was greatly improved in comparison to LEDs with in-situ low temperature GaN nucleation layer. The light output power was 3.7% increased and the reverse bias voltage of leakage current was twice on LEDs with ex-situ PVD AlN nucleation layers. However, larger compressive strain was discovered in LEDs with ex-situ PVD AlN nucleation layers. The study shows the potential and constrain in applying ex-situ PVD AlN nucleation layers to fabricate high quality GaN crystals in various optoelectronics.

  7. Improved performance of GaN based light emitting diodes with ex-situ sputtered AlN nucleation layers

    NASA Astrophysics Data System (ADS)

    Chen, Shuo-Wei; Li, Heng; Lu, Tien-Chang

    2016-04-01

    The crystal quality, electrical and optical properties of GaN based light emitting diodes (LEDs) with ex-situ sputtered physical vapor deposition (PVD) aluminum nitride (AlN) nucleation layers were investigated. It was found that the crystal quality in terms of defect density and x-ray diffraction linewidth was greatly improved in comparison to LEDs with in-situ low temperature GaN nucleation layer. The light output power was 3.7% increased and the reverse bias voltage of leakage current was twice on LEDs with ex-situ PVD AlN nucleation layers. However, larger compressive strain was discovered in LEDs with ex-situ PVD AlN nucleation layers. The study shows the potential and constrain in applying ex-situ PVD AlN nucleation layers to fabricate high quality GaN crystals in various optoelectronics.

  8. Buffer layers on biaxially textured metal substrates

    DOEpatents

    Shoup, Shara S.; Paranthamam, Mariappan; Beach, David B.; Kroeger, Donald M.; Goyal, Amit

    2001-01-01

    A method is disclosed for forming a biaxially textured buffer layer on a biaxially oriented metal substrate by using a sol-gel coating technique followed by pyrolyzing/annealing in a reducing atmosphere. This method is advantageous for providing substrates for depositing electronically active materials thereon.

  9. Deposition of AlN on WS{sub 2} (0001) substrate by atomic layer growth process

    SciTech Connect

    Chung, J.W.; Ohuchi, F.S.

    1997-12-31

    Close proximity of the lattice constant for tungsten disulfide and aluminum nitride has lead to an investigation to use WS{sub 2} as a potential substrate for the growth of AlN. Metal organic chemical vapor deposition (MOCVD) has been developed to fabricated WS{sub 2} thin films on Si(001) with their basal planes parallel to the substrate. AlN thin film was subsequently grown by atomic layer growth (ALG) process using dimethylamine-alane (DMEAA) and ammonia (NH{sub 3}). Deposition conditions for WS2 thin films by MOCVD, and AlN growth on WS2 by ALG are described.

  10. Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films

    SciTech Connect

    Altuntas, Halit E-mail: biyikli@unam.bilkent.edu.tr; Ozgit-Akgun, Cagla; Donmez, Inci; Biyikli, Necmi E-mail: biyikli@unam.bilkent.edu.tr

    2015-04-21

    Here, we report on the current transport mechanisms in AlN thin films deposited at a low temperature (i.e., 200 °C) on p-type Si substrates by plasma-enhanced atomic layer deposition. Structural characterization of the deposited AlN was carried out using grazing-incidence X-ray diffraction, revealing polycrystalline films with a wurtzite (hexagonal) structure. Al/AlN/ p-Si metal-insulator-semiconductor (MIS) capacitor structures were fabricated and investigated under negative bias by performing current-voltage measurements. As a function of the applied electric field, different types of current transport mechanisms were observed; i.e., ohmic conduction (15.2–21.5 MV/m), Schottky emission (23.6–39.5 MV/m), Frenkel-Poole emission (63.8–211.8 MV/m), trap-assisted tunneling (226–280 MV/m), and Fowler-Nordheim tunneling (290–447 MV/m). Electrical properties of the insulating AlN layer and the fabricated Al/AlN/p-Si MIS capacitor structure such as dielectric constant, flat-band voltage, effective charge density, and threshold voltage were also determined from the capacitance-voltage measurements.

  11. Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Tarala, V. A.; Altakhov, A. S.; Ambartsumov, M. G.; Martens, V. Ya.

    2017-01-01

    The possibility of growing oriented AlN films on Al2O3 substrates at temperatures below 300°C by plasma-enhanced atomic layer deposition was examined. The samples were subjected to X-ray phase analysis and ellipsometry. It was demonstrated that the refraction index of films deposited with plasma exposures longer than 20 s was 2.03 ± 0.03. The (0002) and (0004) reflections at 2Θ angles of 35.7° and 75.9° were present in the X-ray diffraction patterns of these samples. These reflections are typical of the hexagonal AlN polytype. The full width at half maximum of the rocking curve of reflection (0002) in the best sample was 162 ± 11 arcsec.

  12. Lightwave coupler utilizing a tapered buffer layer.

    PubMed

    Kishioka, K

    1988-06-01

    We discuss the performance of a lightwave coupler utilizing a tapered buffer layer. The coupler with a ridge waveguide is fabricated on a glass substrate and high coupling efficiencies of 75% and 50% are measured for the operations of coupling from the waveguide to a light beam and from the laser beam into the waveguide, respectively. Further, experimental results of the rigid connection between the optical fiber and the waveguide are demonstrated. We also describe how the coupler differs from the conventional tapered guiding-layer coupler.

  13. Investigation of different mechanisms of GaN growth induced on AlN and GaN nucleation layers

    SciTech Connect

    Tasco, V.; Campa, A.; Tarantini, I.; Passaseo, A.; Gonzalez-Posada, F.; Munoz, E.; Redondo-Cubero, A.; Lorenz, K.; Franco, N.

    2009-03-15

    The evolution of GaN growth on AlN and GaN nucleation layers is compared through morphological and structural analyses, including ion beam analysis. By using AlN nucleation layer grown at high temperature, improved crystalline quality is exhibited by 300 nm thin GaN epilayers. GaN (002) x-ray rocking curve as narrow as 168 arc sec and atomic-step surface morphology characterize such a thin GaN film on AlN. Defects are strongly confined into the first 50 nm of growth, whereas a fast laterally coherent growth is observed when increasing thickness, as an effect of high temperature AlN surface morphology and Ga adatom dynamics over this template.

  14. Acoustic resonator with Al electrodes on an AlN layer and using a GaAs substrate

    DOEpatents

    Kline, Gerald R.; Lakin, Kenneth M.

    1985-12-03

    A method of fabricating an acoustic wave resonator wherein all processing steps are accomplished from a single side of said substrate. The method involves deposition of a multi-layered Al/AlN structure on a GaAs substrate followed by a series of fabrication steps to define a resonator from said composite. The resulting resonator comprises an AlN layer between two Al layers and another layer of AlN on an exterior of one of said Al layers.

  15. Impact of high-temperature annealing of AlN layer on sapphire and its thermodynamic principle

    NASA Astrophysics Data System (ADS)

    Fukuyama, Hiroyuki; Miyake, Hideto; Nishio, Gou; Suzuki, Shuhei; Hiramatsu, Kazumasa

    2016-05-01

    The N2-CO gas annealing technique was demonstrated to improve the crystalline quality of the AlN layer on sapphire. 300-nm-thick AlN layers were fabricated on sapphire substrates by a metal-organic vapor phase epitaxy method. The AlN layers were annealed in N2 and/or N2-CO gas atmosphere at 1923-1973 K for 0.5-4 h. Many pits and voids were observed on the AlN surface annealed in N2 atmosphere at 1973 K for 2 h. The rough surface was, however, much improved for the AlN annealed in N2-CO gas atmosphere. The thermodynamic principle of the N2-CO gas annealing technique is explained in this paper on the basis of the phase stability diagram of the Al2O3-AlN-C-N2-CO system. Voids and γ-aluminum oxynitride (γ-AlON) at the AlN/sapphire interface formed during the annealing, which is also explained on the basis of the phase stability diagram. The in-plane epitaxial relationships among AlN, γ-AlON, and sapphire are presented, and misfits among them are discussed.

  16. Significant improvement of GaN crystal quality with ex-situ sputtered AlN nucleation layers

    NASA Astrophysics Data System (ADS)

    Chen, Shuo-Wei; Yang, Young; Wen, Wei-Chih; Li, Heng; Lu, Tien-Chang

    2016-03-01

    Ex-situ sputtered AlN nucleation layer has been demonstrated effective to significantly improve crystal quality and electrical properties of GaN epitaxy layers for GaN based Light-emitting diodes (LEDs). In this report, we have successfully reduced X-ray (102) FWHM from 240 to 110 arcsec, and (002) FWHM from 230 to 101 arcsec. In addition, reverse-bias voltage (Vr) increased around 20% with the sputtered AlN nucleation layer. Furthermore, output power of LEDs grown on sputtered AlN nucleation layer can be improved around 4.0% compared with LEDs which is with conventional GaN nucleation layer on pattern sapphire substrate (PSS).

  17. Buffer layers and articles for electronic devices

    DOEpatents

    Paranthaman, Mariappan P.; Aytug, Tolga; Christen, David K.; Feenstra, Roeland; Goyal, Amit

    2004-07-20

    Materials for depositing buffer layers on biaxially textured and untextured metallic and metal oxide substrates for use in the manufacture of superconducting and other electronic articles comprise RMnO.sub.3, R.sub.1-x A.sub.x MnO.sub.3, and combinations thereof; wherein R includes an element selected from the group consisting of La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, and Y, and A includes an element selected from the group consisting of Be, Mg, Ca, Sr, Ba, and Ra.

  18. Buffer layer optimization for high efficiency CIGS solar cells

    NASA Astrophysics Data System (ADS)

    Severino, N.; Bednar, N.; Adamovic, N.

    2016-10-01

    This work presents a study concerning the numerical optimization of a buffer layer for high efficiency CIGS solar cells. The dependence of the solar cell properties on the buffer layer material, the layer thickness, the type and density of defects within the same layer were numerically investigated and analysed. Promising results were obtained with alternative Cd-free buffer layers (ZnSnO, InS and ZnS) in place of the standard CdS.

  19. Back contact buffer layer for thin-film solar cells

    DOEpatents

    Compaan, Alvin D.; Plotnikov, Victor V.

    2014-09-09

    A photovoltaic cell structure is disclosed that includes a buffer/passivation layer at a CdTe/Back contact interface. The buffer/passivation layer is formed from the same material that forms the n-type semiconductor active layer. In one embodiment, the buffer layer and the n-type semiconductor active layer are formed from cadmium sulfide (CdS). A method of forming a photovoltaic cell includes the step of forming the semiconductor active layers and the buffer/passivation layer within the same deposition chamber and using the same material source.

  20. Morphology and arrangement of InN nanocolumns deposited by radio-frequency sputtering: Effect of the buffer layer

    NASA Astrophysics Data System (ADS)

    Monteagudo-Lerma, L.; Valdueza-Felip, S.; Núñez-Cascajero, A.; Ruiz, A.; González-Herráez, M.; Monroy, E.; Naranjo, F. B.

    2016-01-01

    We present the structural and optical properties of (0001)-oriented nanocolumnar films of InN deposited on c-sapphire substrates by radio-frequency reactive sputtering. It is observed that the column density and dimensions are highly dependent on the growth parameters of the buffer layer. We investigate four buffer layers consisting of (i) 30 nm of low-growth-rate InN, (ii) 30 nm of AlN deposited on the unbiased substrate (us), (iii) 30 nm of AlN deposited on the reverse-biased substrate (bs), and (iv) a 60-nm-thick bilayer consisting of 30-nm-thick bs-AlN deposited on top of 30-nm-thick us-AlN. Differences in the layer nucleation process due to the buffer layer induce variations of the column density in the range of (2.5-16)×109 cm-2, and of the column diameter in the range of 87-176 nm. Best results in terms of mosaicity are obtained using the bs-AlN buffer layer, which leads to a full width at half-maximum of the InN(0002) rocking curve of 1.2°. A residual compressive strain is still present in the nanocolumns. All samples exhibit room temperature photoluminescence emission at ~1.6 eV, and an apparent optical band gap at ~1.7 eV estimated from linear optical transmittance measurements.

  1. Erratic Dislocations within Funnel Defects in AlN Templates for AlGaNEpitaxial Layer Growth

    SciTech Connect

    Hawkridge, Michael E; Liliental-Weber, Zuzanna; Jin Kim, Hee; Choi, Suk; Yoo, Dongwon; Ryou, Jae-Hyun; Dupuis, Russel D

    2009-03-13

    We report our transmission electron microscopy observations of erraticdislocation behavior within funnel-like defects in the top of AlN templates filled withAlGaN from an overlying epitaxial layer. This dislocation behavior is observed inmaterial where phase separation is also observed. Several bare AlN templates wereexamined to determine the formation mechanism of the funnels. Our results suggest that they are formed prior to epitaxial layer deposition due to the presence of impuritiesduring template re-growth. We discuss the erratic dislocation behavior in relation to thepresence of the phase-separated material and the possible effects of these defects on the optoelectronic properties.

  2. MOCVD growth of N-polar GaN on on-axis sapphire substrate: Impact of AlN nucleation layer on GaN surface hillock density

    NASA Astrophysics Data System (ADS)

    Marini, Jonathan; Leathersich, Jeffrey; Mahaboob, Isra; Bulmer, John; Newman, Neil; (Shadi) Shahedipour-Sandvik, F.

    2016-05-01

    We report on the impact of growth conditions on surface hillock density of N-polar GaN grown on nominally on-axis (0001) sapphire substrate by metal organic chemical vapor deposition (MOCVD). Large reduction in hillock density was achieved by implementation of an optimized high temperature AlN nucleation layer and use of indium surfactant in GaN overgrowth. A reduction by more than a factor of five in hillock density from 1000 to 170 hillocks/cm-2 was achieved as a result. Crystal quality and surface morphology of the resultant GaN films were characterized by high resolution x-ray diffraction and atomic force microscopy and found to be relatively unaffected by the buffer conditions. It is also shown that the density of smaller surface features is unaffected by AlN buffer conditions.

  3. Thin film photovoltaic devices with a minimally conductive buffer layer

    DOEpatents

    Barnes, Teresa M.; Burst, James

    2016-11-15

    A thin film photovoltaic device (100) with a tunable, minimally conductive buffer (128) layer is provided. The photovoltaic device (100) may include a back contact (150), a transparent front contact stack (120), and an absorber (140) positioned between the front contact stack (120) and the back contact (150). The front contact stack (120) may include a low resistivity transparent conductive oxide (TCO) layer (124) and a buffer layer (128) that is proximate to the absorber layer (140). The photovoltaic device (100) may also include a window layer (130) between the buffer layer (128) and the absorber (140). In some cases, the buffer layer (128) is minimally conductive, with its resistivity being tunable, and the buffer layer (128) may be formed as an alloy from a host oxide and a high-permittivity oxide. The high-permittivity oxide may further be chosen to have a bandgap greater than the host oxide.

  4. Improved output power of GaN-based ultraviolet light-emitting diodes with sputtered AlN nucleation layer

    NASA Astrophysics Data System (ADS)

    Chiu, C. H.; Lin, Y. W.; Tsai, M. T.; Lin, B. C.; Li, Z. Y.; Tu, P. M.; Huang, S. C.; Hsu, Earl; Uen, W. Y.; Lee, W. I.; Kuo, H. C.

    2015-03-01

    In this work, the ultraviolet light-emitting diodes (UV-LEDs) at 380 nm were grown on patterned sapphire substrate (PSS) by atmospheric pressure metal organic chemical vapor deposition (AP-MOCVD). A sputtered AlN nucleation layer was utilized on the PSS to enhance the quality of the epitaxial layer. By using high-resolution X-ray diffraction, the full-width at half-maximum of the rocking curve shows that the UV-LEDs with sputtered AlN nucleation layer had better crystalline quality when compared to conventional GaN nucleation samples. From the scanning electron microscope (SEM) and transmission electron microscopy (TEM) images, it can be observed that the tip and sidewall portion of the pattern was smooth using the sputtered AlN nucleation layer. The threading dislocation densities (TDDs) are reduced from 6×107 cm-2 to 2.5×107 cm-2 at the interface between the u-GaN layers for conventional and AlN PSS devices, respectively. As a result, a much higher light output power was achieved. The light output power at an injection current of 20 mA was enhanced by 30%. Further photoluminescence (PL) measurement and numerical simulation confirm that this increase of output power can be attributed to the improvement of material quality and light extraction.

  5. Electron density and currents of AlN/GaN high electron mobility transistors with thin GaN/AlN buffer layer

    SciTech Connect

    Bairamis, A.; Zervos, Ch.; Georgakilas, A.; Adikimenakis, A.; Kostopoulos, A.; Kayambaki, M.; Tsagaraki, K.; Konstantinidis, G.

    2014-09-15

    AlN/GaN high electron mobility transistor (HEMT) structures with thin GaN/AlN buffer layer have been analyzed theoretically and experimentally, and the effects of the AlN barrier and GaN buffer layer thicknesses on two-dimensional electron gas (2DEG) density and transport properties have been evaluated. HEMT structures consisting of [300 nm GaN/ 200 nm AlN] buffer layer on sapphire were grown by plasma-assisted molecular beam epitaxy and exhibited a remarkable agreement with the theoretical calculations, suggesting a negligible influence of the crystalline defects that increase near the heteroepitaxial interface. The 2DEG density varied from 6.8 × 10{sup 12} to 2.1 × 10{sup 13} cm{sup −2} as the AlN barrier thickness increased from 2.2 to 4.5 nm, while a 4.5 nm AlN barrier would result to 3.1 × 10{sup 13} cm{sup −2} on a GaN buffer layer. The 3.0 nm AlN barrier structure exhibited the highest 2DEG mobility of 900 cm{sup 2}/Vs for a density of 1.3 × 10{sup 13} cm{sup −2}. The results were also confirmed by the performance of 1 μm gate-length transistors. The scaling of AlN barrier thickness from 1.5 nm to 4.5 nm could modify the drain-source saturation current, for zero gate-source voltage, from zero (normally off condition) to 0.63 A/mm. The maximum drain-source current was 1.1 A/mm for AlN barrier thickness of 3.0 nm and 3.7 nm, and the maximum extrinsic transconductance was 320 mS/mm for 3.0 nm AlN barrier.

  6. Surface state of GaN after rapid-thermal-annealing using AlN cap-layer

    NASA Astrophysics Data System (ADS)

    El-Zammar, G.; Khalfaoui, W.; Oheix, T.; Yvon, A.; Collard, E.; Cayrel, F.; Alquier, D.

    2015-11-01

    Critical issues need to be overcome to produce high performance Schottky diodes on gallium nitride (GaN). To activate dopant, high temperature thermal treatments are required but damage GaN surface where hexagonal pits appear and prevent any device processing. In this paper, we investigated the efficiency of cap-layers on GaN during thermal treatments to avoid degradation. Aluminum nitride (AlN) and silicon oxide (SiOx) were grown on GaN by direct current reactive magnetron sputtering and plasma-enhanced chemical vapor deposition, respectively. AlN growth parameters were studied to understand their effect on the grown layers and their protection efficiency. Focused ion beam was used to measure AlN layer thickness. Crystalline quality and exact composition were verified using X-ray diffraction and energy dispersive X-ray spectroscopy. Two types of rapid thermal annealing at high temperatures were investigated. Surface roughness and pits density were evaluated using atomic force microscopy and scanning electron microscopy. Cap-layers wet etching was processed in H3PO4 at 120 °C for AlN and in HF (10%) for SiOx. This work reveals effective protection of GaN during thermal treatments at temperatures as high as 1150 °C. Low surface roughness was obtained. Furthermore, no hexagonal pit was observed on the surface.

  7. Buffer layers for REBCO films for use in superconducting devices

    DOEpatents

    Goyal, Amit; Wee, Sung-Hun

    2014-06-10

    A superconducting article includes a substrate having a biaxially textured surface. A biaxially textured buffer layer, which can be a cap layer, is supported by the substrate. The buffer layer includes a double perovskite of the formula A.sub.2B'B''O.sub.6, where A is rare earth or alkaline earth metal and B' and B'' are different transition metal cations. A biaxially textured superconductor layer is deposited so as to be supported by the buffer layer. A method of making a superconducting article is also disclosed.

  8. Buffer layers on metal alloy substrates for superconducting tapes

    DOEpatents

    Jia, Quanxi; Foltyn, Stephen R.; Arendt, Paul N.; Groves, James R.

    2004-10-05

    An article including a substrate, at least one intermediate layer upon the surface of the substrate, a layer of an oriented cubic oxide material having a rock-salt-like structure upon the at least one intermediate layer, and a layer of a SrRuO.sub.3 buffer material upon the oriented cubic oxide material layer is provided together with additional layers such as a HTS top-layer of YBCO directly upon the layer of a SrRuO.sub.3 buffer material layer. With a HTS top-layer of YBCO upon at least one layer of the SrRuO.sub.3 buffer material in such an article, J.sub.c 's of up to 1.3.times.10.sup.6 A/cm.sup.2 have been demonstrated with projected I.sub.c 's of over 200 Amperes across a sample 1 cm wide.

  9. Current isolating epitaxial buffer layers for high voltage photodiode array

    DOEpatents

    Morse, Jeffrey D.; Cooper, Gregory A.

    2002-01-01

    An array of photodiodes in series on a common semi-insulating substrate has a non-conductive buffer layer between the photodiodes and the semi-insulating substrate. The buffer layer reduces current injection leakage between the photodiodes of the array and allows optical energy to be converted to high voltage electrical energy.

  10. High-quality AlGaN/GaN grown on sapphire by gas-source molecular beam epitaxy using a thin low-temperature AlN layer

    SciTech Connect

    Jurkovic, M.J.; Li, L.K.; Turk, B.; Wang, W.I.; Syed, S.; Simonian, D.; Stormer, H.L.

    2000-07-01

    Growth of high-quality AlGaN/GaN heterostructures on sapphire by ammonia gas-source molecular beam epitaxy is reported. Incorporation of a thin AlN layer grown at low temperature within the GaN buffer is shown to result in enhanced electrical and structural characteristics for subsequently grown heterostructures. AlGaN/GaN structures exhibiting reduced background doping and enhanced Hall mobilities (2100, 10310 and 12200 cm{sup 2}/Vs with carrier sheet densities of 6.1 x 10{sup 12} cm{sup {minus}2}, and 5.8 x 10{sup 12} cm{sup {minus}2} at 300 K, 77 K, and 0.3 K, respectively) correlate with dislocation filtering in the thin AlN layer. Magnetotransport measurements at 0.3 K reveal well-resolved Shubnikov-de Haas oscillations starting at 3 T.

  11. Mitigation of substrate defects in reticles using multilayer buffer layers

    DOEpatents

    Mirkarimi, Paul B.; Bajt, Sasa; Stearns, Daniel G.

    2001-01-01

    A multilayer film is used as a buffer layer to minimize the size of defects on a reticle substrate prior to deposition of a reflective coating on the substrate. The multilayer buffer layer deposited intermediate the reticle substrate and the reflective coating produces a smoothing of small particles and other defects on the reticle substrate. The reduction in defect size is controlled by surface relaxation during the buffer layer growth process and by the degree of intermixing and volume contraction of the materials at the multilayer interfaces. The buffer layers are deposited at near-normal incidence via a low particulate ion beam sputtering process. The growth surface of the buffer layer may also be heated by a secondary ion source to increase the degree of intermixing and improve the mitigation of defects.

  12. Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma

    NASA Astrophysics Data System (ADS)

    Goerke, Sebastian; Ziegler, Mario; Ihring, Andreas; Dellith, Jan; Undisz, Andreas; Diegel, Marco; Anders, Solveig; Huebner, Uwe; Rettenmayr, Markus; Meyer, Hans-Georg

    2015-05-01

    Aluminum nitride (AlN) thin films with thicknesses from 20 to 100 nm were deposited on silicon, amorphous silica, silicon nitride, and vitreous carbon by plasma enhanced atomic layer deposition (PE-ALD). Trimethylaluminum (TMA) and a H2/N2 plasma mixture were used as precursors. We investigated the influence of deposition temperature and plasma parameters on the growth characteristics and the film properties of AlN. Stable PE-ALD growth conditions were obtained from 150 °C to the highest tested temperature of 300 °C. The growth rate, refractive index, and thickness homogeneity on 4″ wafers were determined by spectroscopic ellipsometry. X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM) and Rutherford backscattering spectrometry (RBS) were carried out to analyze crystallinity and composition of the films. Furthermore, the thermal conductivity and the film stress were determined. The stress was sufficiently low to fabricate mechanically stable free-standing AlN membranes with lateral dimensions of up to 2.2 × 2.2 mm2. The membranes were patterned with focused ion beam etching. Thus, these AlN membranes qualify as dielectric support material for a variety of potential applications.

  13. Buffer layers for high-Tc thin films on sapphire

    NASA Technical Reports Server (NTRS)

    Wu, X. D.; Foltyn, S. R.; Muenchausen, R. E.; Cooke, D. W.; Pique, A.; Kalokitis, D.; Pendrick, V.; Belohoubek, E.

    1992-01-01

    Buffer layers of various oxides including CeO2 and yttrium-stabilized zirconia (YSZ) have been deposited on R-plane sapphire. The orientation and crystallinity of the layers were optimized to promote epitaxial growth of YBa2Cu3O(7-delta) (YBCO) thin films. An ion beam channeling minimum yield of about 3 percent was obtained in the CeO2 layer on sapphire, indicating excellent crystallinity of the buffer layer. Among the buffer materials used, CeO2 was found to be the best one for YBCO thin films on R-plane sapphire. High Tc and Jc were obtained in YBCO thin films on sapphire with buffer layers. Surface resistances of the YBCO films were about 4 mOmega at 77 K and 25 GHz.

  14. On buffer layers as non-reflecting computational boundaries

    NASA Technical Reports Server (NTRS)

    Hayder, M. Ehtesham; Turkel, Eli L.

    1996-01-01

    We examine an absorbing buffer layer technique for use as a non-reflecting boundary condition in the numerical simulation of flows. One such formulation was by Ta'asan and Nark for the linearized Euler equations. They modified the flow inside the buffer zone to artificially make it supersonic in the layer. We examine how this approach can be extended to the nonlinear Euler equations. We consider both a conservative and a non-conservative form modifying the governing equations in the buffer layer. We compare this with the case that the governing equations in the layer are the same as in the interior domain. We test the effectiveness of these buffer layers by a simulation of an excited axisymmetric jet based on a nonlinear compressible Navier-Stokes equations.

  15. On buffer layers as non-reflecting computational boundaries

    NASA Technical Reports Server (NTRS)

    Hayder, M. Ehtesham; Turkel, Eli L.

    1996-01-01

    We examine an absorbing buffer layer technique for use as a non-reflecting boundary condition in the numerical simulation of flows. One such formulation was by Ta'asan and Nark for the linearized Euler equations. They modified the flow inside the buffer zone to artificially make it supersonic in the layer. We examine how this approach can be extended to the nonlinear Euler equations. We consider both a conservative and a non-conservative form modifying the governing equations in the buffer layer. We compare this with the case that the governing equations in the layer are the same as in the interior domain. We test the effectiveness of these buffer layers by a simulation of an excited axisymmetric jet based on a nonlinear compressible Navier-Stokes equations.

  16. Buffer layers for high-Tc thin films on sapphire

    NASA Technical Reports Server (NTRS)

    Wu, X. D.; Foltyn, S. R.; Muenchausen, R. E.; Cooke, D. W.; Pique, A.; Kalokitis, D.; Pendrick, V.; Belohoubek, E.

    1992-01-01

    Buffer layers of various oxides including CeO2 and yttrium-stabilized zirconia (YSZ) have been deposited on R-plane sapphire. The orientation and crystallinity of the layers were optimized to promote epitaxial growth of YBa2Cu3O(7-delta) (YBCO) thin films. An ion beam channeling minimum yield of about 3 percent was obtained in the CeO2 layer on sapphire, indicating excellent crystallinity of the buffer layer. Among the buffer materials used, CeO2 was found to be the best one for YBCO thin films on R-plane sapphire. High Tc and Jc were obtained in YBCO thin films on sapphire with buffer layers. Surface resistances of the YBCO films were about 4 mOmega at 77 K and 25 GHz.

  17. Enhanced adhesion for LIGA microfabrication by using a buffer layer

    DOEpatents

    Bajikar, Sateesh S.; De Carlo, Francesco; Song, Joshua J.

    2001-01-01

    The present invention is an improvement on the LIGA microfabrication process wherein a buffer layer is applied to the upper or working surface of a substrate prior to the placement of a resist onto the surface of the substrate. The buffer layer is made from an inert low-Z material (low atomic weight), a material that absorbs secondary X-rays emissions from the substrate that are generated from the substrate upon exposure to a primary X-rays source. Suitable materials for the buffer layer include polyamides and polyimide. The preferred polyimide is synthesized form pyromellitic anhydride and oxydianiline (PMDA-ODA).

  18. Enhanced adhesion for LIGA microfabrication by using a buffer layer

    DOEpatents

    Bajikar, Sateesh S.; De Carlo, Francesco; Song, Joshua J.

    2004-01-27

    The present invention is an improvement on the LIGA microfabrication process wherein a buffer layer is applied to the upper or working surface of a substrate prior to the placement of a resist onto the surface of the substrate. The buffer layer is made from an inert low-Z material (low atomic weight), a material that absorbs secondary X-rays emissions from the substrate that are generated from the substrate upon exposure to a primary X-rays source. Suitable materials for the buffer layer include polyamides and polyimide. The preferred polyimide is synthesized form pyromellitic anhydride and oxydianiline (PMDA-ODA).

  19. In-situ NC-AFM measurements of high quality AlN(0001) layers grown at low growth rate on 4H-SiC(0001) and Si(111) substrates using ammonia molecular beam epitaxy

    SciTech Connect

    Chaumeton, Florian Gauthier, Sébastien Martrou, David

    2015-06-15

    Nitride wide-band-gap semiconductors are used to make high power electronic devices or efficient light sources. The performance of GaN-based devices is directly linked to the initial AlN buffer layer. During the last twenty years of research on nitride growth, only few information on the AlN surface quality have been obtained, mainly by ex-situ characterization techniques. Thanks to a Non Contact Atomic Force Microscope (NC-AFM) connected under ultra high vacuum (UHV) to a dedicated molecular beam epitaxy (MBE) chamber, the surface of AlN(0001) thin films grown on Si(111) and 4H-SiC(0001) substrates has been characterized. These experiments give access to a quantitative determination of the density of screw and edge dislocations at the surface. The layers were also characterized by ex-situ SEM to observe the largest defects such as relaxation dislocations and hillocks. The influence of the growth parameters (substrate temperature, growth speed, III/V ratio) and of the initial substrate preparation on the dislocation density was also investigated. On Si(111), the large in-plane lattice mismatch with AlN(0001) (19%) induces a high dislocation density ranging from 6 to 12×10{sup 10}/cm{sup 2} depending on the growth conditions. On 4H-SiC(0001) (1% mismatch with AlN(0001)), the dislocation density decreases to less than 10{sup 10}/cm{sup 2}, but hillocks appear, depending on the initial SiC(0001) reconstruction. The use of a very low growth rate of 10 nm/h at the beginning of the growth process allows to decrease the dislocation density below 2 × 10{sup 9}/cm{sup 2}.

  20. Rare earth zirconium oxide buffer layers on metal substrates

    DOEpatents

    Williams, Robert K.; Paranthaman, Mariappan; Chirayil, Thomas G.; Lee, Dominic F.; Goyal, Amit; Feenstra, Roeland

    2001-01-01

    A laminate article comprises a substrate and a biaxially textured (RE.sub.x A.sub.(1-x)).sub.2 O.sub.2-(x/2) buffer layer over the substrate, wherein 0buffer layer can be deposited using sol-gel or metal-organic decomposition. The laminate article can include a layer of YBCO over the (RE.sub.x A.sub.(1-x)).sub.2 O.sub.2-(x/2) buffer layer. A layer of CeO.sub.2 between the YBCO layer and the (RE.sub.x A.sub.(1-x)).sub.2 O.sub.2-(x/2) buffer layer can also be include. Further included can be a layer of YSZ between the CeO.sub.2 layer and the (RE.sub.x A.sub.(1-x)).sub.2 O.sub.2-(x/2) buffer layer. The substrate can be a biaxially textured metal, such as nickel. A method of forming the laminate article is also disclosed.

  1. Method of depositing buffer layers on biaxially textured metal substrates

    DOEpatents

    Beach, David B.; Morrell, Jonathan S.; Paranthaman, Mariappan; Chirayil, Thomas; Specht, Eliot D.; Goyal, Amit

    2002-08-27

    A laminate article comprises a substrate and a biaxially textured (RE.sup.1.sub.x RE.sup.2.sub.(1-x)).sub.2 O.sub.3 buffer layer over the substrate, wherein 0buffer layer can be deposited using sol-gel or metal-organic decomposition. The laminate article can include a layer of YBCO over the (RE.sup.1.sub.x RE.sup.2.sub.(1-x)).sub.2 O.sub.3 buffer layer. A layer of CeO.sub.2 between the YBCO layer and the (RE.sup.1.sub.x RE.sup.2.sub.(1-x)).sub.2 O.sub.3 buffer can also be include. Further included can be a layer of YSZ between the CeO.sub.2 layer and the (RE.sup.1.sub.x RE.sup.2.sub.(1-x)).sub.2 O.sub.3 buffer layer. The substrate can be a biaxially textured metal, such as nickel. A method of forming the laminate article is also disclosed.

  2. Heteroepitaxial growth of GaN on atomically flat LiTaO 3 (0 0 0 1) using low-temperature AIN buffer layers

    NASA Astrophysics Data System (ADS)

    Tsuchiya, Y.; Kobayashi, A.; Ohta, J.; Fujioka, H.; Oshima, M.

    2006-07-01

    We have grown GaN films on atomically-flat LiTaO 3 substrates by using pulsed laser deposition (PLD), and we then investigated the effect of the use of low-temperature AlN (LT-AlN) buffer layers on the structural properties of GaN. The full-width at half-maximum (FWHM) values for the crystal orientation distribution of the GaN films in the tilt directions were reduced from 0.48° to 0.17°, and those in the twist directions were reduced from 0.40° to 0.17° by the incorporation of AlN buffer layers grown at 580 °C. The surface morphology of GaN has also been improved by the insertion of LT-AlN buffer layers. X-ray reflectivity measurements have revealed that the interfacial layer thickness between LT-AlN and LiTaO 3 is as thin as 1.7 nm, and that the increase in the interfacial layer thickness caused by annealing at up to 700 °C is quite small. These results indicate that the PLD growth of GaN on atomically flat substrates using LT-AlN buffer layers is quite promising for achieving GaN on LiTaO 3.

  3. Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films

    SciTech Connect

    Van Bui, Hao Wiggers, Frank B.; Gupta, Anubha; Nguyen, Minh D.; Aarnink, Antonius A. I.; Jong, Michel P. de; Kovalgin, Alexey Y.

    2015-01-01

    The authors have studied and compared the initial growth and properties of AlN films deposited on Si(111) by thermal and plasma-enhanced atomic layer deposition (ALD) using trimethylaluminum and either ammonia or a N{sub 2}-H{sub 2} mixture as precursors. In-situ spectroscopic ellipsometry was employed to monitor the growth and measure the refractive index of the films during the deposition. The authors found that an incubation stage only occurred for thermal ALD. The linear growth for plasma-enhanced ALD (PEALD) started instantly from the beginning due to the higher nuclei density provided by the presence of plasma. The authors observed the evolution of the refractive index of AlN during the growth, which showed a rapid increase up to a thickness of about 30 nm followed by a saturation. Below this thickness, higher refractive index values were obtained for AlN films grown by PEALD, whereas above that the refractive index was slightly higher for thermal ALD films. X-ray diffraction characterization showed a wurtzite crystalline structure with a (101{sup ¯}0) preferential orientation obtained for all the layers with a slightly better crystallinity for films grown by PEALD.

  4. Buffer layers on metal alloy substrates for superconducting tapes

    DOEpatents

    Jia, Quanxi; Foltyn, Stephen R.; Arendt, Paul N.; Groves, James R.

    2004-06-29

    An article including a substrate, a layer of an inert oxide material upon the surface of the substrate, a layer of an amorphous oxide or oxynitride material upon the inert oxide material layer, a layer of an oriented cubic oxide material having a rock-salt-like structure upon the amorphous oxide material layer, and a layer of a SrRuO.sub.3 buffer material upon the oriented cubic oxide material layer is provided together with additional layers such as a HTS top-layer of YBCO directly upon the layer of a SrRuO.sub.3 buffer material layer. With a HTS top-layer of YBCO upon at least one layer of the SrRuO.sub.3 buffer material in such an article, J.sub.c 's of up to 1.3.times.10.sup.6 A/cm.sup.2 have been demonstrated with projected IC's of over 200 Amperes across a sample 1 cm wide.

  5. Study of buffer layer thickness on bulk heterojunction solar cell.

    PubMed

    Noh, Seunguk; Suman, C K; Lee, Donggu; Kim, Seohee; Lee, Changhee

    2010-10-01

    We studied the effect of the buffer layer (molybdenum-oxide (MoO3)) thickness on the performance of organic solar cell based on blends of poly(3-hexylthiophene) (P3HT) and [6,6]-phenyl-C61 butyric acid methyl ester fullerene derivative (PCBM). The thickness of MoO3 was varied from 1 nm to 30 nm for optimization of device performance. The photocurrent-voltage and impedance spectroscopy were measured under dark and AM1.5G solar simulated illumination of 100 mW/cm2 for exploring the role of the buffer layer thickness on carrier collection at an anode. The MoO3 thickness of the optimized device (efficiency approximately 3.7%) was found to be in the range of 5 approximately 10 nm. The short-circuit current and the shunt resistance decrease gradually for thicker MoO3 layer over 5 nm. The device can be modeled as the combination of three RC parallel circuits (each one for the active layer, buffer layer and interface between the buffer layer and the active layer) in series with contact resistance (Rs approximately 60 ohm).

  6. Influence of high-temperature AlN intermediate layer on the optical properties of MOCVD grown AlGaN films

    NASA Astrophysics Data System (ADS)

    Xie, Deng; Qiu, Zhi Ren; Liu, Yao; Talwar, Devki N.; Wan, Lingyu; Zhang, Xiong; Mei, Ting; Ferguson, Ian T.; Feng, Zhe Chuan

    2017-02-01

    By combining spectroscopic ellipsometry (SE) and optical transmission (OT) characterization methods we have systematically investigated the influence of AlN intermediate layer and AlN transition layer on the optical properties of AlGaN epilayers grown on sapphire by metalorganic chemical vapor deposition (MOCVD) method. Most dielectric functions of III-nitrides obtained by different research groups show significant band-tail absorption—which is not anticipated for such a direct band gap material. The dielectric functions are studied for a series of AlGaN/AlN/Al2O3 structures, with a four-layer model taking into account both high temperature grown AlN layer and low temperature grown AlN layer. The results obtained by fitting the optical parameters to experimental data show that the band-tail absorption should originate from the transition layer. AlGaN film without high temperature AlN epilayer exhibited a redshift of band gap around 0.24 eV.

  7. Conductive and robust nitride buffer layers on biaxially textured substrates

    DOEpatents

    Sankar, Sambasivan [Chicago, IL; Goyal, Amit [Knoxville, TN; Barnett, Scott A [Evanston, IL; Kim, Ilwon [Skokie, IL; Kroeger, Donald M [Knoxville, TN

    2009-03-31

    The present invention relates to epitaxial, electrically conducting and mechanically robust, cubic nitride buffer layers deposited epitaxially on biaxially textured substrates such as metals and alloys. The invention comprises of a biaxially textured substrate with epitaxial layers of nitrides. The invention also discloses a method to form such epitaxial layers using a high rate deposition method as well as without the use of forming gases. The invention further comprises epitaxial layers of oxides on the biaxially textured nitride layer. In some embodiments the article further comprises electromagnetic devices which may have superconducting properties.

  8. Conductive and robust nitride buffer layers on biaxially textured substrates

    DOEpatents

    Sankar, Sambasivan; Goyal, Amit; Barnett, Scott A.; Kim, Ilwon; Kroeger, Donald M.

    2004-08-31

    The present invention relates to epitaxial, electrically conducting and mechanically robust, cubic nitride buffer layers deposited epitaxially on biaxially textured substrates such as metal and alloys. The invention comprises of a biaxially textured substrate with epitaxial layers of nitrides. The invention also discloses a method to form such epitaxial layers using a high rate deposition method as well as without the use of forming gases. The invention further comprises epitaxial layers of oxides on the biaxially textured nitride layers. In some embodiments the article further comprises electromagnetic devices which may be super conducting properties.

  9. Microscopic potential fluctuations in Si-doped AlGaN epitaxial layers with various AlN molar fractions and Si concentrations

    SciTech Connect

    Kurai, Satoshi Yamada, Yoichi; Miyake, Hideto; Hiramatsu, Kazumasa

    2016-01-14

    Nanoscopic potential fluctuations of Si-doped AlGaN epitaxial layers with the AlN molar fraction varying from 0.42 to 0.95 and Si-doped Al{sub 0.61}Ga{sub 0.39}N epitaxial layers with Si concentrations of 3.0–37 × 10{sup 17 }cm{sup −3} were investigated by cathodoluminescence (CL) imaging combined with scanning electron microscopy. The spot CL linewidths of AlGaN epitaxial layers broadened as the AlN molar fraction was increased to 0.7, and then narrowed at higher AlN molar fractions. The experimental linewidths were compared with the theoretical prediction from the alloy broadening model. The trends displayed by our spot CL linewidths were consistent with calculated results at AlN molar fractions of less than about 0.60, but the spot CL linewidths were markedly broader than the calculated linewidths at higher AlN molar fractions. The dependence of the difference between the spot CL linewidth and calculated line broadening on AlN molar fraction was found to be similar to the dependence of reported S values, indicating that the vacancy clusters acted as the origin of additional line broadening at high AlN molar fractions. The spot CL linewidths of Al{sub 0.61}Ga{sub 0.39}N epitaxial layers with the same Al concentration and different Si concentrations were nearly constant in the entire Si concentration range tested. From the comparison of reported S values, the increase of V{sub Al} did not contribute to the linewidth broadening, unlike the case of the V{sub Al} clusters.

  10. Structural and electrical properties of AlN layers grown on silicon by reactive RF magnetron sputtering

    SciTech Connect

    Bazlov, N. Pilipenko, N. Vyvenko, O.; Petrov, Yu.; Mikhailovskii, V.; Ubyivovk, E.; Kotina, I.; Zharinov, V.

    2016-06-17

    AlN films of different thicknesses were deposited on n-Si (100) substrates by reactive radio frequency (rf) magnetron sputtering. Dependences of structure and electrical properties on thickness of deposited films were researched. The structures of the films were analyzed with scanning electron microscopy (SEM) and with transmitting electron microscopy (TEM). Electrical properties of the films were investigated on Au-AlN-(n-Si) structures by means of current-voltage (I-V), capacitance-voltage (C-V) and deep level transient spectroscopy (DLTS) techniques. Electron microscopy investigations had shown that structure and chemical composition of the films were thickness stratified. Near silicon surface layer was amorphous aluminum oxide one contained traps of positive charges with concentration of about 4 × 10{sup 18} cm{sup −3}. Upper layers were nanocrystalline ones consisted of both wurzite AlN and cubic AlON nanocrystals. They contained traps both positive and negative charges which were situated within 30 nm distance from silicon surface. Surface densities of these traps were about 10{sup 12} cm{sup −2}. Electron traps with activation energies of (0.2 ÷ 0.4) eV and densities of about 10{sup 10} cm{sup −2} were revealed on interface between aluminum oxide layer and silicon substrate. Their densities varied weakly with the film thickness.

  11. Substrate-induced magnetism in epitaxial graphene buffer layers.

    PubMed

    Ramasubramaniam, A; Medhekar, N V; Shenoy, V B

    2009-07-08

    Magnetism in graphene is of fundamental as well as technological interest, with potential applications in molecular magnets and spintronic devices. While defects and/or adsorbates in freestanding graphene nanoribbons and graphene sheets have been shown to cause itinerant magnetism, controlling the density and distribution of defects and adsorbates is in general difficult. We show from first principles calculations that graphene buffer layers on SiC(0001) can also show intrinsic magnetism. The formation of graphene-substrate chemical bonds disrupts the graphene pi-bonds and causes localization of graphene states near the Fermi level. Exchange interactions between these states lead to itinerant magnetism in the graphene buffer layer. We demonstrate the occurrence of magnetism in graphene buffer layers on both bulk-terminated as well as more realistic adatom-terminated SiC(0001) surfaces. Our calculations show that adatom density has a profound effect on the spin distribution in the graphene buffer layer, thereby providing a means of engineering magnetism in epitaxial graphene.

  12. Efficiency improvement of GaN-based ultraviolet light-emitting diodes with reactive plasma deposited AlN nucleation layer on patterned sapphire substrate

    PubMed Central

    2014-01-01

    The flip chip ultraviolet light-emitting diodes (FC UV-LEDs) with a wavelength of 365 nm are developed with the ex situ reactive plasma deposited (RPD) AlN nucleation layer on patterned sapphire substrate (PSS) by an atmospheric pressure metal-organic chemical vapor deposition (AP MOCVD). The ex situ RPD AlN nucleation layer can significantly reduce dislocation density and thus improve the crystal quality of the GaN epitaxial layers. Utilizing high-resolution X-ray diffraction, the full width at half maximum of the rocking curve shows that the crystalline quality of the epitaxial layer with the (RPD) AlN nucleation layer is better than that with the low-temperature GaN (LT-GaN) nucleation layer. The threading dislocation density (TDD) is estimated by transmission electron microscopy (TEM), which shows the reduction from 6.8 × 107 cm−2 to 2.6 × 107 cm−2. Furthermore, the light output power (LOP) of the LEDs with the RPD AlN nucleation layer has been improved up to 30 % at a forward current of 350 mA compared to that of the LEDs grown on PSS with conventional LT-GaN nucleation layer. PMID:25258616

  13. Efficiency improvement of GaN-based ultraviolet light-emitting diodes with reactive plasma deposited AlN nucleation layer on patterned sapphire substrate

    NASA Astrophysics Data System (ADS)

    Lee, Chia-Yu; Tzou, An-Jye; Lin, Bing-Cheng; Lan, Yu-Pin; Chiu, Ching-Hsueh; Chi, Gou-Chung; Chen, Chi-Hsiang; Kuo, Hao-Chung; Lin, Ray-Ming; Chang, Chun-Yen

    2014-09-01

    The flip chip ultraviolet light-emitting diodes (FC UV-LEDs) with a wavelength of 365 nm are developed with the ex situ reactive plasma deposited (RPD) AlN nucleation layer on patterned sapphire substrate (PSS) by an atmospheric pressure metal-organic chemical vapor deposition (AP MOCVD). The ex situ RPD AlN nucleation layer can significantly reduce dislocation density and thus improve the crystal quality of the GaN epitaxial layers. Utilizing high-resolution X-ray diffraction, the full width at half maximum of the rocking curve shows that the crystalline quality of the epitaxial layer with the (RPD) AlN nucleation layer is better than that with the low-temperature GaN (LT-GaN) nucleation layer. The threading dislocation density (TDD) is estimated by transmission electron microscopy (TEM), which shows the reduction from 6.8 × 107 cm-2 to 2.6 × 107 cm-2. Furthermore, the light output power (LOP) of the LEDs with the RPD AlN nucleation layer has been improved up to 30 % at a forward current of 350 mA compared to that of the LEDs grown on PSS with conventional LT-GaN nucleation layer.

  14. Buffer layer engineering on graphene via various oxidation methods for atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Takahashi, Nobuaki; Nagashio, Kosuke

    2016-12-01

    The integration of a high-k oxide on graphene using atomic layer deposition requires an electrically reliable buffer layer. In this study, Y was selected as the buffer layer due to its highest oxidation ability among the rare-earth elements, and various oxidation methods (atmospheric, and high-pressure O2 and ozone annealing) were applied to the Y metal buffer layer. By optimizing the oxidation conditions of the top-gate insulator, we successfully improved the capacitance of the top gate Y2O3 insulator and demonstrated a large I on/I off ratio for bilayer graphene under an external electric field.

  15. Evaluation of AlGaN/GaN high electron mobility transistors grown on ZrTi buffer layers with sapphire substrates

    SciTech Connect

    Ren, Fan; Pearton, Stephen J.; Ahn, Shihyun; Lin, Yi -Hsuan; Machuca, Francisco; Weiss, Robert; Welsh, Alex; McCartney, Martha R.; Smith, David J.; Kravchenko, Ivan I.

    2016-09-21

    Here, AlGaN/GaN high electron mobility transistors (HEMTs) have been grown on sapphire substrates, using ZrTi buffer layers to provide in-plane lattice-matching to hexagonal GaN. X-ray diffraction (XRD) as well as cross-section transmission electron microscopy (TEM) were used to assess the quality of the HEMT structure. The XRD 2θ scans showed full-width-at-half-maximum values of 0.16°, 0.07°, and 0.08° for ZrTi alloy, GaN buffer layer, and the entire HEMT structure, respectively. TEM studies of the GaN buffer layer and the AlN/ZrTi/AlN stack showed the importance of growing thin AlN buffer layers on the ZrTi layer prior to growth of the GaN buffer layer. The density of threading dislocations in the GaN channel layer of the HEMT structure was estimated to be in the 108 cm–2 range. The HEMT device exhibited a saturation drain current density of 820 mA/mm, and the channel of the fabricated HEMTs could be well modulated. A cutoff frequency (fT) of 8.9 GHz and a maximum frequency of oscillation (fmax) of 17.3 GHz were achieved for HEMTs with gate dimensions of 1 × 200 μm.

  16. Evaluation of AlGaN/GaN high electron mobility transistors grown on ZrTi buffer layers with sapphire substrates

    SciTech Connect

    Ren, Fan; Pearton, Stephen J.; Ahn, Shihyun; Lin, Yi -Hsuan; Machuca, Francisco; Weiss, Robert; Welsh, Alex; McCartney, Martha R.; Smith, David J.; Kravchenko, Ivan I.

    2016-09-21

    Here, AlGaN/GaN high electron mobility transistors (HEMTs) have been grown on sapphire substrates, using ZrTi buffer layers to provide in-plane lattice-matching to hexagonal GaN. X-ray diffraction (XRD) as well as cross-section transmission electron microscopy (TEM) were used to assess the quality of the HEMT structure. The XRD 2θ scans showed full-width-at-half-maximum values of 0.16°, 0.07°, and 0.08° for ZrTi alloy, GaN buffer layer, and the entire HEMT structure, respectively. TEM studies of the GaN buffer layer and the AlN/ZrTi/AlN stack showed the importance of growing thin AlN buffer layers on the ZrTi layer prior to growth of the GaN buffer layer. The density of threading dislocations in the GaN channel layer of the HEMT structure was estimated to be in the 108 cm–2 range. The HEMT device exhibited a saturation drain current density of 820 mA/mm, and the channel of the fabricated HEMTs could be well modulated. A cutoff frequency (fT) of 8.9 GHz and a maximum frequency of oscillation (fmax) of 17.3 GHz were achieved for HEMTs with gate dimensions of 1 × 200 μm.

  17. On the feasibility of silicene encapsulation by AlN deposited using an atomic layer deposition process

    SciTech Connect

    Van Bui, H. E-mail: M.P.deJong@utwente.nl; Wiggers, F. B.; Kovalgin, A. Y.; Jong, M. P. de E-mail: M.P.deJong@utwente.nl; Friedlein, R.; Yamada-Takamura, Y.

    2015-02-14

    Since epitaxial silicene is not chemically inert under ambient conditions, its application in devices and the ex-situ characterization outside of ultrahigh vacuum environments require the use of an insulating capping layer. Here, we report on a study of the feasibility of encapsulating epitaxial silicene on ZrB{sub 2}(0001) thin films grown on Si(111) substrates by aluminum nitride (AlN) deposited using trimethylaluminum (TMA) and ammonia (NH{sub 3}) precursors. By in-situ high-resolution core-level photoelectron spectroscopy, the chemical modifications of the surface due to subsequent exposure to TMA and NH{sub 3} molecules, at temperatures of 300 °C and 400 °C, respectively, have been investigated. While an AlN-related layer can indeed be grown, silicene reacts strongly with both precursor molecules resulting in the formation of Si–C and Si–N bonds such that the use of these precursors does not allow for the protective AlN encapsulation that leaves the electronic properties of silicene intact.

  18. On the feasibility of silicene encapsulation by AlN deposited using an atomic layer deposition process

    NASA Astrophysics Data System (ADS)

    Van Bui, H.; Wiggers, F. B.; Friedlein, R.; Yamada-Takamura, Y.; Kovalgin, A. Y.; de Jong, M. P.

    2015-02-01

    Since epitaxial silicene is not chemically inert under ambient conditions, its application in devices and the ex-situ characterization outside of ultrahigh vacuum environments require the use of an insulating capping layer. Here, we report on a study of the feasibility of encapsulating epitaxial silicene on ZrB2(0001) thin films grown on Si(111) substrates by aluminum nitride (AlN) deposited using trimethylaluminum (TMA) and ammonia (NH3) precursors. By in-situ high-resolution core-level photoelectron spectroscopy, the chemical modifications of the surface due to subsequent exposure to TMA and NH3 molecules, at temperatures of 300 °C and 400 °C, respectively, have been investigated. While an AlN-related layer can indeed be grown, silicene reacts strongly with both precursor molecules resulting in the formation of Si-C and Si-N bonds such that the use of these precursors does not allow for the protective AlN encapsulation that leaves the electronic properties of silicene intact.

  19. Semiconducting chalcogenide buffer layer for oxide heteroepitaxy on Si(001)

    NASA Astrophysics Data System (ADS)

    Schmidt, D. A.; Ohta, Taisuke; Lu, C.-Y.; Bostwick, Aaron A.; Yu, Q.; Rotenberg, Eli; Ohuchi, F. S.; Olmstead, Marjorie A.

    2006-05-01

    We report controlled laminar growth of a crystalline transition metal oxide on Si(001) without SiOx or silicide formation by utilizing the chalcogenide semiconductor gallium sesquiselenide (Ga2Se3) as a nonreactive buffer layer. Initial nucleation of both pure and Co-doped anatase (TiO2) is along Ga2Se3 nanowire structures, coalescing to a flat, multidomain film within two molecular layers. Arsenic-terminated Si(001) [Si(001):As] is stable against pure O2, but oxidizes when both Ti and O2 are present. The Si -TiO2 valence band offset using either buffer layer is about 2.8eV, producing a staggered band alignment.

  20. Electrical conduction and dielectric relaxation properties of AlN thin films grown by hollow-cathode plasma-assisted atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Altuntas, Halit; Bayrak, Turkan; Kizir, Seda; Haider, Ali; Biyikli, Necmi

    2016-07-01

    In this study, aluminum nitride (AlN) thin films were deposited at 200 °C, on p-type silicon substrates utilizing a capacitively coupled hollow-cathode plasma source integrated atomic layer deposition (ALD) reactor. The structural properties of AlN were characterized by grazing incidence x-ray diffraction, by which we confirmed the hexagonal wurtzite single-phase crystalline structure. The films exhibited an optical band edge around ˜5.7 eV. The refractive index and extinction coefficient of the AlN films were measured via a spectroscopic ellipsometer. In addition, to investigate the electrical conduction mechanisms and dielectric properties, Al/AlN/p-Si metal-insulator-semiconductor capacitor structures were fabricated, and current density-voltage and frequency dependent (7 kHz-5 MHz) dielectric constant measurements (within the strong accumulation region) were performed. A peak of dielectric loss was observed at a frequency of 3 MHz and the Cole-Davidson empirical formula was used to determine the relaxation time. It was concluded that the native point defects such as nitrogen vacancies and DX centers formed with the involvement of Si atoms into the AlN layers might have influenced the electrical conduction and dielectric relaxation properties of the plasma-assisted ALD grown AlN films.

  1. A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Altuntas, Halit; Bayrak, Turkan

    2016-12-01

    In this work, we aimed to investigate the effects of two different plasma sources on the electrical properties of low-temperature plasma-assisted atomic layer deposited (PA-ALD) AlN thin films. To compare the electrical properties, 50 nm thick AlN films were grown on p-type Si substrates at 200 °C by using an inductively coupled RF-plasma (ICP) and a stainless steel hollow cathode plasma-assisted (HCPA) ALD systems. Al/AlN/p-Si metal-insulator-semiconductor (MIS) capacitor devices were fabricated and capacitance versus voltage (C-V) and current-voltage (I-V) measurements performed to assess the basic important electrical parameters such as dielectric constant, effective charge density, flat-band voltage, breakdown field, and threshold voltage. In addition, structural properties of the films were presented and compared. The results show that although HCPA-ALD deposited AlN thin films has structurally better and has a lower effective charge density (N eff ) value than ICP-ALD deposited AlN films, those films have large leakage current, low dielectric constant, and low breakdown field. This situation was attributed to the involvement of Si atoms into the AlN layers during the HCPA-ALD processing leads to additional current path at AlN/Si interface and might impair the electrical properties.

  2. A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Altuntas, Halit; Bayrak, Turkan

    2017-03-01

    In this work, we aimed to investigate the effects of two different plasma sources on the electrical properties of low-temperature plasma-assisted atomic layer deposited (PA-ALD) AlN thin films. To compare the electrical properties, 50 nm thick AlN films were grown on p-type Si substrates at 200 °C by using an inductively coupled RF-plasma (ICP) and a stainless steel hollow cathode plasma-assisted (HCPA) ALD systems. Al/AlN/ p-Si metal-insulator-semiconductor (MIS) capacitor devices were fabricated and capacitance versus voltage ( C- V) and current-voltage ( I- V) measurements performed to assess the basic important electrical parameters such as dielectric constant, effective charge density, flat-band voltage, breakdown field, and threshold voltage. In addition, structural properties of the films were presented and compared. The results show that although HCPA-ALD deposited AlN thin films has structurally better and has a lower effective charge density ( N eff ) value than ICP-ALD deposited AlN films, those films have large leakage current, low dielectric constant, and low breakdown field. This situation was attributed to the involvement of Si atoms into the AlN layers during the HCPA-ALD processing leads to additional current path at AlN/Si interface and might impair the electrical properties.

  3. Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer

    PubMed Central

    Qian, Qingkai; Li, Baikui; Hua, Mengyuan; Zhang, Zhaofu; Lan, Feifei; Xu, Yongkuan; Yan, Ruyue; Chen, Kevin J.

    2016-01-01

    Transistors based on MoS2 and other TMDs have been widely studied. The dangling-bond free surface of MoS2 has made the deposition of high-quality high-k dielectrics on MoS2 a challenge. The resulted transistors often suffer from the threshold voltage instability induced by the high density traps near MoS2/dielectric interface or inside the gate dielectric, which is detrimental for the practical applications of MoS2 metal-oxide-semiconductor field-effect transistor (MOSFET). In this work, by using AlN deposited by plasma enhanced atomic layer deposition (PEALD) as an interfacial layer, top-gate dielectrics as thin as 6 nm for single-layer MoS2 transistors are demonstrated. The AlN interfacial layer not only promotes the conformal deposition of high-quality Al2O3 on the dangling-bond free MoS2, but also greatly enhances the electrical stability of the MoS2 transistors. Very small hysteresis (ΔVth) is observed even at large gate biases and high temperatures. The transistor also exhibits a low level of flicker noise, which clearly originates from the Hooge mobility fluctuation instead of the carrier number fluctuation. The observed superior electrical stability of MoS2 transistor is attributed to the low border trap density of the AlN interfacial layer, as well as the small gate leakage and high dielectric strength of AlN/Al2O3 dielectric stack. PMID:27279454

  4. Ab initio modeling of zincblende AlN layer in Al-AlN-TiN multilayers

    SciTech Connect

    Yadav, S. K. E-mail: yadav.satyesh@gmail.com Liu, X.-Y. E-mail: yadav.satyesh@gmail.com; Wang, J.

    2016-06-14

    An unusual growth mechanism of metastable zincblende AlN thin film by diffusion of nitrogen atoms into Al lattice is established. Using first-principles density functional theory, we studied the possibility of thermodynamic stability of AlN as a zincblende phase due to epitaxial strains and interface effect, which fails to explain the formation of zincblende AlN. We then compared the formation energetics of rocksalt and zincblende AlN in fcc Al through direct diffusion of nitrogen atoms to Al octahedral and tetrahedral interstitials. The formation of a zincblende AlN thin film is determined to be a kinetically driven process, not a thermodynamically driven process.

  5. Improved thermal stability and electrical properties of atomic layer deposited HfO{sub 2}/AlN high-k gate dielectric stacks on GaAs

    SciTech Connect

    Cao, Yan-Qiang; Li, Xin; Zhu, Lin; Cao, Zheng-Yi; Wu, Di; Li, Ai-Dong

    2015-01-15

    The thermal stability and electrical properties of atomic layer deposited HfO{sub 2}/AlN high-k gate dielectric stacks on GaAs were investigated. Compared to HfO{sub 2}/Al{sub 2}O{sub 3} gate dielectric, significant improvements in interfacial quality as well as electrical characteristics after postdeposition annealing are confirmed by constructing HfO{sub 2}/AlN dielectric stacks. The chemical states were carefully explored by the x-ray photoelectron spectroscopy, which indicates the AlN layers effectively prevent from the formation of defective native oxides at elevated temperatures. In addition, it is found that NH{sub 3} plasma during AlN plasma-enhanced atomic layer deposition also has the self-cleaning effect as Al(CH{sub 3}){sub 3} in removing native oxides. The passivating AlN layers suppress the formation of interfacial oxide and trap charge, leading to the decrease of capacitance equivalent thickness after annealing. Moreover, HfO{sub 2}/AlN/GaAs sample has a much lower leakage current density of 2.23 × 10{sup −4} A/cm{sup 2} than HfO{sub 2}/Al{sub 2}O{sub 3}/GaAs sample of 2.58 × 10{sup −2} A/cm{sup 2}. For the HfO{sub 2}/AlN/GaAs sample annealed at 500 °C, it has a lowest interface trap density value of 2.11 × 10{sup 11} eV{sup −1} cm{sup −2}. These results indicate that adopting HfO{sub 2}/AlN dielectric stacks may be a promising approach for the realization of high quality GaAs-based transistor devices.

  6. Advanced titania buffer layer architectures prepared by chemical solution deposition

    NASA Astrophysics Data System (ADS)

    Kunert, J.; Bäcker, M.; Brunkahl, O.; Wesolowski, D.; Edney, C.; Clem, P.; Thomas, N.; Liersch, A.

    2011-08-01

    Chemical solution deposition (CSD) was used to grow high-quality (100) oriented films of SrTiO3 (STO) on CSD CaTiO3 (CTO), Ba0.1Ca0.9TiO3 (BCT) and STO seed and template layers. These template films bridge the lattice misfit between STO and the nickel-tungsten (NiW) substrate, assisting in dense growth of textured STO. Additional niobium (Nb) doping of the STO buffer layer reduces oxygen diffusion which is necessary to avoid undesired oxidation of the NiW. The investigated templates offer suitable alternatives to established standard buffer systems like La2Zr2O7 (LZO) and CeO2 for coated conductors.

  7. Effects of GaN/AlGaN/Sputtered AlN nucleation layers on performance of GaN-based ultraviolet light-emitting diodes

    PubMed Central

    Hu, Hongpo; Zhou, Shengjun; Liu, Xingtong; Gao, Yilin; Gui, Chengqun; Liu, Sheng

    2017-01-01

    We report on the demonstration of GaN-based ultraviolet light-emitting diodes (UV LEDs) emitting at 375 nm grown on patterned sapphire substrate (PSS) with in-situ low temperature GaN/AlGaN nucleation layers (NLs) and ex-situ sputtered AlN NL. The threading dislocation (TD) densities in GaN-based UV LEDs with GaN/AlGaN/sputtered AlN NLs were determined by high-resolution X-ray diffraction (XRD) and cross-sectional transmission electron microscopy (TEM), which revealed that the TD density in UV LED with AlGaN NL was the highest, whereas that in UV LED with sputtered AlN NL was the lowest. The light output power (LOP) of UV LED with AlGaN NL was 18.2% higher than that of UV LED with GaN NL owing to a decrease in the absorption of 375 nm UV light in the AlGaN NL with a larger bandgap. Using a sputtered AlN NL instead of the AlGaN NL, the LOP of UV LED was further enhanced by 11.3%, which is attributed to reduced TD density in InGaN/AlInGaN active region. In the sputtered AlN thickness range of 10–25 nm, the LOP of UV LED with 15-nm-thick sputtered AlN NL was the highest, revealing that optimum thickness of the sputtered AlN NL is around 15 nm. PMID:28294166

  8. Effects of GaN/AlGaN/Sputtered AlN nucleation layers on performance of GaN-based ultraviolet light-emitting diodes

    NASA Astrophysics Data System (ADS)

    Hu, Hongpo; Zhou, Shengjun; Liu, Xingtong; Gao, Yilin; Gui, Chengqun; Liu, Sheng

    2017-03-01

    We report on the demonstration of GaN-based ultraviolet light-emitting diodes (UV LEDs) emitting at 375 nm grown on patterned sapphire substrate (PSS) with in-situ low temperature GaN/AlGaN nucleation layers (NLs) and ex-situ sputtered AlN NL. The threading dislocation (TD) densities in GaN-based UV LEDs with GaN/AlGaN/sputtered AlN NLs were determined by high-resolution X-ray diffraction (XRD) and cross-sectional transmission electron microscopy (TEM), which revealed that the TD density in UV LED with AlGaN NL was the highest, whereas that in UV LED with sputtered AlN NL was the lowest. The light output power (LOP) of UV LED with AlGaN NL was 18.2% higher than that of UV LED with GaN NL owing to a decrease in the absorption of 375 nm UV light in the AlGaN NL with a larger bandgap. Using a sputtered AlN NL instead of the AlGaN NL, the LOP of UV LED was further enhanced by 11.3%, which is attributed to reduced TD density in InGaN/AlInGaN active region. In the sputtered AlN thickness range of 10-25 nm, the LOP of UV LED with 15-nm-thick sputtered AlN NL was the highest, revealing that optimum thickness of the sputtered AlN NL is around 15 nm.

  9. Defect Reduction in Epitaxial Growth using Superlattice Buffer Layers.

    DTIC Science & Technology

    1986-12-01

    nocrnmr’Y end Wenoy &iV block number) PIEL GROUP SUS. OR. It. ABSTRACT (Coniw~ai. on wfeer ifwem’ end idenet by adacanumbori A A R . P 9 0GI O F O N U )cl...fully used as buffer layers to reduce dislocations originating Lett, 48, 281 (1986). 944 AppI . Phys. Lett., Vol. 49, No. 15. 13 October 1986 Bedair

  10. Growth and stress-induced transformation of zinc blende AlN layers in Al-AlN-TiN multilayers

    SciTech Connect

    Li, Nan; Yadav, Satyesh K.; Wang, Jian; Liu, Xiang -Yang; Misra, Amit

    2015-12-18

    We report that AlN nanolayers in sputter deposited {111}Al/AlN/TiN multilayers exhibit the metastable zinc-blende-structure (z-AlN). Based on density function theory calculations, the growth of the z-AlN is ascribed to the kinetically and energetically favored nitridation of the deposited aluminium layer. In situ nanoindentation of the as-deposited {111}Al/AlN/TiN multilayers in a high-resolution transmission electron microscope revealed the z-AlN to wurzite AlN phase transformation through collective glide of Shockley partial dislocations on every two {111} planes of the z-AlN.

  11. Growth and Stress-induced Transformation of Zinc blende AlN Layers in Al-AlN-TiN Multilayers

    PubMed Central

    Li, Nan; Yadav, Satyesh K.; Wang, Jian; Liu, Xiang-Yang; Misra, Amit

    2015-01-01

    AlN nanolayers in sputter deposited {111}Al/AlN/TiN multilayers exhibit the metastable zinc-blende-structure (z-AlN). Based on density function theory calculations, the growth of the z-AlN is ascribed to the kinetically and energetically favored nitridation of the deposited aluminium layer. In situ nanoindentation of the as-deposited {111}Al/AlN/TiN multilayers in a high-resolution transmission electron microscope revealed the z-AlN to wurzite AlN phase transformation through collective glide of Shockley partial dislocations on every two {111} planes of the z-AlN. PMID:26681109

  12. Growth and stress-induced transformation of zinc blende AlN layers in Al-AlN-TiN multilayers

    DOE PAGES

    Li, Nan; Yadav, Satyesh K.; Wang, Jian; ...

    2015-12-18

    We report that AlN nanolayers in sputter deposited {111}Al/AlN/TiN multilayers exhibit the metastable zinc-blende-structure (z-AlN). Based on density function theory calculations, the growth of the z-AlN is ascribed to the kinetically and energetically favored nitridation of the deposited aluminium layer. In situ nanoindentation of the as-deposited {111}Al/AlN/TiN multilayers in a high-resolution transmission electron microscope revealed the z-AlN to wurzite AlN phase transformation through collective glide of Shockley partial dislocations on every two {111} planes of the z-AlN.

  13. Evaluation of AlGaN/GaN high electron mobility transistors grown on ZrTi buffer layers with sapphire substrates

    DOE PAGES

    Ren, Fan; Pearton, Stephen J.; Ahn, Shihyun; ...

    2016-09-21

    Here, AlGaN/GaN high electron mobility transistors (HEMTs) have been grown on sapphire substrates, using ZrTi buffer layers to provide in-plane lattice-matching to hexagonal GaN. X-ray diffraction (XRD) as well as cross-section transmission electron microscopy (TEM) were used to assess the quality of the HEMT structure. The XRD 2θ scans showed full-width-at-half-maximum values of 0.16°, 0.07°, and 0.08° for ZrTi alloy, GaN buffer layer, and the entire HEMT structure, respectively. TEM studies of the GaN buffer layer and the AlN/ZrTi/AlN stack showed the importance of growing thin AlN buffer layers on the ZrTi layer prior to growth of the GaN buffermore » layer. The density of threading dislocations in the GaN channel layer of the HEMT structure was estimated to be in the 108 cm–2 range. The HEMT device exhibited a saturation drain current density of 820 mA/mm, and the channel of the fabricated HEMTs could be well modulated. A cutoff frequency (fT) of 8.9 GHz and a maximum frequency of oscillation (fmax) of 17.3 GHz were achieved for HEMTs with gate dimensions of 1 × 200 μm.« less

  14. Electrical properties of GaAs metal-oxide-semiconductor structure comprising Al2O3 gate oxide and AlN passivation layer fabricated in situ using a metal-organic vapor deposition/atomic layer deposition hybrid system

    NASA Astrophysics Data System (ADS)

    Aoki, Takeshi; Fukuhara, Noboru; Osada, Takenori; Sazawa, Hiroyuki; Hata, Masahiko; Inoue, Takayuki

    2015-08-01

    This paper presents a compressive study on the fabrication and optimization of GaAs metal-oxide-semiconductor (MOS) structures comprising a Al2O3 gate oxide, deposited via atomic layer deposition (ALD), with an AlN interfacial passivation layer prepared in situ via metal-organic chemical vapor deposition (MOCVD). The established protocol afforded self-limiting growth of Al2O3 in the atmospheric MOCVD reactor. Consequently, this enabled successive growth of MOCVD-formed AlN and ALD-formed Al2O3 layers on the GaAs substrate. The effects of AlN thickness, post-deposition anneal (PDA) conditions, and crystal orientation of the GaAs substrate on the electrical properties of the resulting MOS capacitors were investigated. Thin AlN passivation layers afforded incorporation of optimum amounts of nitrogen, leading to good capacitance-voltage (C-V) characteristics with reduced frequency dispersion. In contrast, excessively thick AlN passivation layers degraded the interface, thereby increasing the interfacial density of states (Dit) near the midgap and reducing the conduction band offset. To further improve the interface with the thin AlN passivation layers, the PDA conditions were optimized. Using wet nitrogen at 600 °C was effective to reduce Dit to below 2 × 1012 cm-2 eV-1. Using a (111)A substrate was also effective in reducing the frequency dispersion of accumulation capacitance, thus suggesting the suppression of traps in GaAs located near the dielectric/GaAs interface. The current findings suggest that using an atmosphere ALD process with in situ AlN passivation using the current MOCVD system could be an efficient solution to improving GaAs MOS interfaces.

  15. Temperature dependence of the crystalline quality of AlN layer grown on sapphire substrates by metalorganic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Li, Xiao-Hang; Wei, Yong O.; Wang, Shuo; Xie, Hongen; Kao, Tsung-Ting; Satter, Md. Mahbub; Shen, Shyh-Chiang; Douglas Yoder, P.; Detchprohm, Theeradetch; Dupuis, Russell D.; Fischer, Alec M.; Ponce, Fernando A.

    2015-03-01

    We studied temperature dependence of crystalline quality of AlN layers at 1050-1250 °C with a fine increment step of around 18 °C. The AlN layers were grown on c-plane sapphire substrates by metalorganic chemical vapor deposition (MOCVD) and characterized by X-ray diffraction (XRD) ω-scans and atomic force microscopy (AFM). At 1050-1068 °C, the templates exhibited poor quality with surface pits and higher XRD (002) and (102) full-width at half-maximum (FWHM) because of insufficient Al atom mobility. At 1086 °C, the surface became smooth suggesting sufficient Al atom mobility. Above 1086 °C, the (102) FWHM and thus edge dislocation density increased with temperatures which may be attributed to the shorter growth mode transition from three-dimension (3D) to two-dimension (2D). Above 1212 °C, surface macro-steps were formed due to the longer diffusion length of Al atoms than the expected step terrace width. The edge dislocation density increased rapidly above 1212 °C, indicating this temperature may be a threshold above which the impact of the transition from 3D to 2D is more significant. The (002) FWHM and thus screw dislocation density were insensitive to the temperature change. This study suggests that high-quality AlN/sapphire templates may be potentially achieved at temperatures as low as 1086 °C which is accessible by most of the III-nitride MOCVD systems.

  16. Selective area growth of high-density GaN nanowire arrays on Si(111) using thin AlN seeding layers

    NASA Astrophysics Data System (ADS)

    Wu, C. H.; Lee, P. Y.; Chen, K. Y.; Tseng, Y. T.; Wang, Y. L.; Cheng, K. Y.

    2016-11-01

    Selective area growth (SAG) of high-density (2.5×109 cm-2) GaN nanowires (NWs) on Si(111) substrate by plasma-assisted molecular beam epitaxy is presented. The effects of morphology and thickness of the AlN seeding layer on the quality of SAG GaN NWs are investigated. A thin AlN seeding layer of 30 nm thick with a surface roughness of less than 0.5 nm is suitable for high quality SAG GaN NWs growth. High-density AlN nanopedestal arrays used as seeds for SAG GaN NWs are fabricated from thin AlN seeding layers using soft nanoimprint lithography. By adjusting the growth temperature and Ga/N flux ratio, hexagonal shaped SAG GaN NWs are realized. The quality of SAG GaN NWs is evaluated by low temperature photoluminescence (PL) measurements. Three major groups of PL peaks at 3.47, 3.45, and 3.41 eV are identified. The peak at 3.471 eV is related to the neutral donor-bound exciton emission, and the 3.41 eV broadband emission is attributed to stacking faults or structural defects. The 3.45 eV peak is identified as the emission due to exciton recombination at polar inversion domain boundaries of NWs.

  17. High Jc coated conductors with a simple buffer layer architecture

    NASA Astrophysics Data System (ADS)

    Gianni, L.; Baldini, A.; Bindi, M.; Gauzzi, A.; Rampino, S.; Zannella, S.

    2005-10-01

    We report on the in situ route for the continuous fabrication of YBCO coated conductors (CC) by thermal co-evaporation. CC architecture consists of YBCO film grown on biaxially textured Ni-alloys tapes buffered with a single layer of CeO2. The buffer layer deposition has been optimized by either e-beam or thermal evaporation using respectively ceria or metallic cerium. Best results have been obtained on CeO2 film, with a thickness less or equal than 100 nm, grown in a reducing atmosphere at 690 °C with a growth rate of 2.4 Å/s. The optimal samples exhibit a highly biaxial texture, as indicated by FWHM values in the range of 5-8° and 4-6° for respectively in- and out-of-plane orientations. The layers are characterized by an uniform and crack-free surface with an average roughness lower than 10 nm. SIMS analysis confirms the effectiveness of CeO2 buffer layer against Ni interdiffusion. This template allows to obtain YBCO films strong textured, with good superconductive properties. YBCO texture data are equivalent the CeO2 ones. Midpoint critical temperature, Tc, falls reproducibly in 87-88 K range, with transition widths ΔTc < 2-3 K. Critical current density, Jc, up to 2 MA/cm2 at 77 K in self-field, have been achieved in a meter long CC corresponding to Ic/width value of 130 A/cm-width. Uniformity and reproducibility of long CC properties are under optimization.

  18. Alloys containing antimony as metamorphic buffer layer for device applications

    NASA Astrophysics Data System (ADS)

    Rodriguez, Benny Perez

    This work explores the stress/strain relaxation kinetics in metamorphic buffer layers of GaAs1-xSbx/GaAs (001) grown by molecular beam epitaxy. The real-time stress/strain evolution was obtained using an in situ multi-beam optical sensor measurement, and combined with detailed analysis from x-ray diffraction, transmission electron microscopy, and atomic force microscopy. Several distinct stages of the strain relaxation were observed during growth of GaAs1-xSbx constant composition buffer layers, which are separated into three main regimes: pseudomorphic growth, fast strain relaxation and saturation. Constant composition layers of GaAs0.5Sb0.5/GaAs initially relax elastically followed by the rapid nucleation of both 60° and pure edge dislocations. The saturation regime is distinguished by coalescence of small islands that appears to trigger the formation of threading dislocations. The strain relaxation profile for GaAs0.5Sb0.5, GaAs0.61Sb0.39, and In0.2Ga0.8As films were modeled using Dodson and Tsao's model of effective stress, with a new representation for elastic interactions of misfit dislocations. The model results agree with the experimental data and show that repulsive interaction of misfit dislocations is responsible for the large residual stress. Using this model, estimated line dislocation densities are in good agreement with the values obtained experimentally. This could have potential application in the design of metamorphic buffer layers because our observations are made in real time on individual growth, without the need of external characterization to measure the dislocation density. In addition, this model offers new insights in estimating the dislocation glide energy for simulation purposes. Linearly graded GaAs1-xSbx films resulted in a decreased Sb incorporation, higher residual stress, and bifurcation in the tilt of the sample. Less aggressive grading resulted in more uniform incorporation and lower residual stress. Step graded films resulted in

  19. High-temperature carrier density and mobility enhancements in AlGaN/GaN HEMT using AlN spacer layer

    NASA Astrophysics Data System (ADS)

    Ko, Tsung-Shine; Lin, Der-Yuh; Lin, Chia-Feng; Chang, Che-Wei; Zhang, Jin-Cheng; Tu, Shang-Ju

    2017-04-01

    In this paper, we experimentally studied the effect of AlN spacer layer on optical and electrical properties of AlGaN/GaN high electric mobility transistors (HEMTs) grown by metal organic chemical vapor deposition method. For AlGaN layer in HEMT structure, the Al composition of the sample was determined using x-ray diffraction and photoluminescence. Electrolyte electro-reflectance (EER) measurement not only confirmed the aluminum composition of AlGaN layer, but also determined the electric field strength on the AlGaN layer through the Franz-Keldysh oscillation phenomenon. This result indicated that the electric field on the AlGaN layer could be improved from 430 to 621 kV/cm when AlN spacer layer was inserted in HEMT structure, which increased the concentration of two dimensional electron gas (2DEG) and improve the mobility. The temperature dependent Hall results show that both the mobility and the carrier concentration of 2DEG would decrease abruptly causing HEMT loss of function due to phonon scattering and carrier thermal escape when temperature increases above a specific value. Meanwhile, our study also demonstrates using AlN spacer layer could be beneficial to allow the mobility and carrier density of 2DEG sustaining at high temperature region.

  20. Improved AlGaN/GaN high electron mobility transistor using AlN interlayers

    NASA Astrophysics Data System (ADS)

    Jiménez, A.; Bougrioua, Z.; Tirado, J. M.; Braña, A. F.; Calleja, E.; Muñoz, E.; Moerman, I.

    2003-06-01

    This work reports on the effects of AlN interlayers embedded into the GaN semi-insulating buffer of AlGaN/GaN high electron mobility transistors, in comparison with standard heterostructures without AlN interlayers. Detailed optical and structural characterization data are presented, along with computer simulation results. The AlN interlayers generate a compressive strain in the GaN topmost layer, which slightly reduces the total polarization field, but most important, it prevents the AlGaN barrier from plastic relaxation. The final result is an enhanced polarization field with respect to standard heterostructures, providing an increased channel carrier density and pinch-off voltage. Electrical characterization confirms the advantages of using AlN interlayers, reaching maximum drain current density and extrinsic transconductance as high as 1.4 A/mm and 266 mS/mm, respectively, for 0.2-μm gate length.

  1. Photo-induced wettability of TiO{sub 2} film with Au buffer layer

    SciTech Connect

    Purkayastha, Debarun Dhar; Sangani, L. D. Varma; Krishna, M. Ghanashyam; Madhurima, V.

    2014-04-24

    The effect of thickness of Au buffer layer (15-25 nm) between TiO{sub 2} film and substrate on the wettability of TiO{sub 2} films is reported. TiO{sub 2} films grown on Au buffer layer have a higher contact angle of 96-;100° as compared to 47.6o for the film grown without buffer layer. The transition from hydrophobicity to hydrophilicity under UV irradiation occurs within 10 min. for the buffer layered films whereas it is almost 30 min. for the film grown without buffer layer. The enhanced photo induced hydrophilicity is shown to be surface energy driven.

  2. Buffer layers on rolled nickel or copper as superconductor substrates

    DOEpatents

    Paranthaman, Mariappan; Lee, Dominic F.; Kroeger, Donald M.; Goyal, Amit

    2000-01-01

    Buffer layer architectures are epitaxially deposited on biaxially-textured rolled substrates of nickel and/or copper and their alloys for high current conductors, and more particularly buffer layer architectures such as Y.sub.2 O.sub.3 /Ni, YSZ/Y.sub.2 O.sub.3 /Ni, Yb.sub.2 O.sub.3 /Ni, Yb.sub.2 O.sub.3 /Y.sub.2 O.sub.3 /Ni, Yb.sub.2 O.sub.3 /CeO.sub.2 /Ni, RE.sub.2 O.sub.3 /Ni (RE=Rare Earth), and Yb.sub.2 O.sub.3 /YSZ/CeO.sub.2 /Ni, Y.sub.2 O.sub.3 /Cu, YSZ/Y.sub.2 O.sub.3 /Cu, Yb.sub.2 O.sub.3 /Cu, Yb.sub.2 O.sub.3 /Y.sub.2 O.sub.3 /Cu, Yb.sub.2 O.sub.3 /CeO.sub.2 /Cu, RE.sub.2 O.sub.3 /Cu, and Yb.sub.2 O.sub.3 /YSZ/CeO.sub.2 /Cu. Deposition methods include physical vapor deposition techniques which include electron-beam evaporation, rf magnetron sputtering, pulsed laser deposition, thermal evaporation, and solution precursor approach, which includes chemical vapor deposition, combustion CVD, metal-organic decomposition, sol-gel processing, and plasma spray.

  3. Ab initio modeling of zincblende AlN layer in Al-AlN-TiN multilayers

    DOE PAGES

    Yadav, S. K.; Wang, J.; Liu, X. -Y.

    2016-06-13

    An unusual growth mechanism of metastable zincblende AlN thin film by diffusion of nitrogen atoms into Al lattice is established. Using first-principles density functional theory, we studied the possibility of thermodynamic stability of AlN as a zincblende phase due to epitaxial strains and interface effect, which fails to explain the formation of zincblende AlN. We then compared the formation energetics of rocksalt and zincblende AlN in fcc Al through direct diffusion of nitrogen atoms to Al octahedral and tetrahedral interstitials. Furthermore, the formation of a zincblende AlN thin film is determined to be a kinetically driven process, not a thermodynamicallymore » driven process.« less

  4. Development of Production PVD-AIN Buffer Layer System and Processes to Reduce Epitaxy Costs and Increase LED Efficiency

    SciTech Connect

    Cerio, Frank

    2013-09-14

    The DOE has set aggressive goals for solid state lighting (SSL) adoption, which require manufacturing and quality improvements for virtually all process steps leading to an LED luminaire product. The goals pertinent to this proposed project are to reduce the cost and improve the quality of the epitaxial growth processes used to build LED structures. The objectives outlined in this proposal focus on achieving cost reduction and performance improvements over state-of-the-art, using technologies that are low in cost and amenable to high efficiency manufacturing. The objectives of the outlined proposal focus on cost reductions in epitaxial growth by reducing epitaxy layer thickness and hetero-epitaxial strain, and by enabling the use of larger, less expensive silicon substrates and would be accomplished through the introduction of a high productivity reactive sputtering system and an effective sputtered aluminum-nitride (AlN) buffer/nucleation layer process. Success of the proposed project could enable efficient adoption of GaN on-silicon (GaN/Si) epitaxial technology on 150mm silicon substrates. The reduction in epitaxy cost per cm{sup 2} using 150mm GaN-on-Si technology derives from (1) a reduction in cost of ownership and increase in throughput for the buffer deposition process via the elimination of MOCVD buffer layers and other throughput and CoO enhancements, (2) improvement in brightness through reductions in defect density, (3) reduction in substrate cost through the replacement of sapphire with silicon, and (4) reduction in non-ESD yield loss through reductions in wafer bow and temperature variation. The adoption of 150mm GaN/Si processing will also facilitate significant cost reductions in subsequent wafer fabrication manufacturing costs. There were three phases to this project. These three phases overlap in order to aggressively facilitate a commercially available production GaN/Si capability. In Phase I of the project, the repeatability of the performance

  5. A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs

    NASA Astrophysics Data System (ADS)

    Krylov, Igor; Pokroy, Boaz; Ritter, Dan; Eizenberg, Moshe

    2016-02-01

    Thermal activated atomic layer deposited (t) (ALD) and plasma enhanced (p) ALD (PEALD) AlN films were investigated for gate applications of InGaAs based metal-insulator-semiconductor devices and compared to the well-known Al2O3 based system. The roles of post-metallization annealing (PMA) and the pre-deposition treatment (PDT) by either trimethylaluminium (TMA) or NH3 were studied. In contrast to the case of Al2O3, in the case of AlN, the annealing temperature reduced interface states density. In addition, improvement of the AlN film stoichiometry and a related border traps density reduction were observed following PMA. The lowest interface states density (among the investigated gate stacks) was found for PEALD AlN/InGaAs stacks after TMA PDT. At the same time, higher values of the dispersion in accumulation were observed for AlN/InGaAs gate stacks compared to those with Al2O3 dielectric. No indium out-diffusion and the related leakage current degradation due to annealing were observed at the AlN/InGaAs stack. In light of these findings, we conclude that AlN is a promising material for InGaAs based gate stack applications.

  6. Leakage effects in n-GaAs MESFET with n-GaAs buffer layer

    NASA Technical Reports Server (NTRS)

    Wang, Y. C.; Bahrami, M.

    1983-01-01

    Whereas improvement of the interface between the active layer and the buffer layer has been demonstrated, the leakage effects can be important if the buffer layer resistivity is not sufficiently high and/or the buffer layer thickness is not sufficiently small. It was found that two buffer leakage currents exist from the channel under the gate to the source and from drain to the channel in addition to the buffer leakage resistance between drain and source. It is shown that for a 1 micron gate-length n-GaAs MESFET, if the buffer layer resistivity is 12 OHM-CM and the buffer layer thickness h is 2 microns, the performance of the device degrades drastically. It is suggested that h should be below 2 microns.

  7. Leakage effects in n-GaAs MESFET with n-GaAs buffer layer

    NASA Technical Reports Server (NTRS)

    Wang, Y. C.; Bahrami, M.

    1983-01-01

    Whereas improvement of the interface between the active layer and the buffer layer has been demonstrated, the leakage effects can be important if the buffer layer resistivity is not sufficiently high and/or the buffer layer thickness is not sufficiently small. It was found that two buffer leakage currents exist from the channel under the gate to the source and from drain to the channel in addition to the buffer leakage resistance between drain and source. It is shown that for a 1 micron gate-length n-GaAs MESFET, if the buffer layer resistivity is 12 OHM-CM and the buffer layer thickness h is 2 microns, the performance of the device degrades drastically. It is suggested that h should be below 2 microns.

  8. Improved interface properties of GaN metal-oxide-semiconductor device with non-polar plane and AlN passivation layer

    NASA Astrophysics Data System (ADS)

    Wu, Xian; Liang, Renrong; Guo, Lei; Liu, Lei; Xiao, Lei; Shen, Shanshan; Xu, Jun; Wang, Jing

    2016-12-01

    Utilizing a non-polar plane substrate and an ultra-thin AlN passivation layer results in significantly improved interface properties of a GaN metal-oxide-semiconductor (MOS) device. After depositing an Al2O3 gate dielectric layer on GaN substrates with polar c-plane and non-polar m-plane surfaces, it is found that the devices on the non-polar surface show much better interface properties than those on the polar surface. To further improve the interface properties, an amorphous ultra-thin AlN layer is deposited on the substrate before the Al2O3 deposition. The interface properties of both devices on the c-plane and m-plane are dramatically improved by the AlN passivation layer. The interface trap density of the Al/Al2O3/AlN/GaN MOS capacitor on the non-polar surface is reduced by two orders of magnitude compared to that on the polar surface.

  9. Doped Y.sub.2O.sub.3 buffer layers for laminated conductors

    DOEpatents

    Paranthaman, Mariappan Parans [Knoxville, TN; Schoop, Urs [Westborough, MA; Goyal, Amit [Knoxville, TN; Thieme, Cornelis Leo Hans [Westborough, MA; Verebelyi, Darren T [Oxford, MA; Rupich, Martin W [Framingham, MA

    2007-08-21

    A laminated conductor includes a metallic substrate having a surface, a biaxially textured buffer layer supported by the surface of the metallic substrate, the biaxially textured buffer layer comprising Y.sub.2O.sub.3 and a dopant for blocking cation diffusion through the Y.sub.2O.sub.3, and a biaxially textured conductor layer supported by the biaxially textured buffer layer.

  10. Study on the influence of different trench-patterned templates on the crystalline microstructure of AlN epitaxial films by X-ray microdiffraction

    NASA Astrophysics Data System (ADS)

    Thanh Khan, Dinh; Takeuchi, Shotaro; Nakamura, Yoshiaki; Nakamura, Kunihiko; Arauchi, Takuji; Miyake, Hideto; Hiramatsu, Kazumasa; Imai, Yasuhiko; Kimura, Shigeru; Sakai, Akira

    2017-02-01

    The crystalline microstructure of AlN films epitaxially grown on trench-patterned templates of AlN/α-Al2O3 and α-Al2O3 was studied by position-dependent X-ray microdiffraction measurements of AlN 11\\bar{2}4 and 0004 Bragg reflections. The crystalline microstructure of the AlN films is highly anisotropic and periodic corresponding to the periodicity in the trench pattern of templates. The lattice tilting fluctuation in the AlN film grown on the trench-patterned α-Al2O3 template is about one-half order of magnitude larger than that in the AlN film grown on the trench-patterned AlN/α-Al2O3 template. This is likely to be related to the significant misorientation initiated at the growth of AlN crystal domains from the sidewalls of the α-Al2O3 template without AlN buffer layers and the difference in contact areas at the AlN film/α-Al2O3 interface between the two samples. These findings suggest that trench-patterned templates of AlN/α-Al2O3 are suitable for growing thick high-quality AlN films.

  11. Strain states of AlN/GaN-stress mitigating layer and their effect on GaN buffer layer grown by ammonia molecular beam epitaxy on 100-mm Si(111)

    SciTech Connect

    Ravikiran, L.; Radhakrishnan, K.; Agrawal, M.; Dharmarasu, N.; Munawar Basha, S.

    2013-09-28

    The effect of strain states of AlN/GaN-stress mitigating layer (SML) on buried crack density and its subsequent influence on the residual stresses in GaN buffer layers grown using ammonia-molecular beam epitaxy on 100-mm Si(111) substrate has been investigated. Different stages involved in the formation of buried cracks, which are crack initialization, growth of relaxed AlN layer, and subsequent lateral over growth, are identified using in-situ curvature measurements. While the increase of GaN thickness in AlN/GaN-SML enhanced its compressive strain relaxation and resulted in reduced buried crack spacing, the variation of AlN thickness did not show any effect on the crack spacing. Moreover, the decrease in the crack spacing (or increase in the buried crack density) was found to reduce the residual compression in 1st and 2nd GaN layers of AlN/GaN-SML structure. The higher buried crack density relaxed the compressive strain in 1st GaN layer, which further reduced its ability to compensate the tensile stress generated during substrate cool down, and hence resulted in lower residual compressive stress in 2nd GaN layer.

  12. Strain states of AlN/GaN-stress mitigating layer and their effect on GaN buffer layer grown by ammonia molecular beam epitaxy on 100-mm Si(111)

    NASA Astrophysics Data System (ADS)

    Ravikiran, L.; Radhakrishnan, K.; Dharmarasu, N.; Agrawal, M.; Munawar Basha, S.

    2013-09-01

    The effect of strain states of AlN/GaN-stress mitigating layer (SML) on buried crack density and its subsequent influence on the residual stresses in GaN buffer layers grown using ammonia-molecular beam epitaxy on 100-mm Si(111) substrate has been investigated. Different stages involved in the formation of buried cracks, which are crack initialization, growth of relaxed AlN layer, and subsequent lateral over growth, are identified using in-situ curvature measurements. While the increase of GaN thickness in AlN/GaN-SML enhanced its compressive strain relaxation and resulted in reduced buried crack spacing, the variation of AlN thickness did not show any effect on the crack spacing. Moreover, the decrease in the crack spacing (or increase in the buried crack density) was found to reduce the residual compression in 1st and 2nd GaN layers of AlN/GaN-SML structure. The higher buried crack density relaxed the compressive strain in 1st GaN layer, which further reduced its ability to compensate the tensile stress generated during substrate cool down, and hence resulted in lower residual compressive stress in 2nd GaN layer.

  13. Superconducting composite with multilayer patterns and multiple buffer layers

    DOEpatents

    Wu, X.D.; Muenchausen, R.E.

    1993-10-12

    An article of manufacture is described including a substrate, a patterned interlayer of a material selected from the group consisting of magnesium oxide, barium-titanium oxide or barium-zirconium oxide, the patterned interlayer material overcoated with a secondary interlayer material of yttria-stabilized zirconia or magnesium-aluminum oxide, upon the surface of the substrate whereby an intermediate article with an exposed surface of both the overcoated patterned interlayer and the substrate is formed, a coating of a buffer layer selected from the group consisting of cerium oxide, yttrium oxide, curium oxide, dysprosium oxide, erbium oxide, europium oxide, iron oxide, gadolinium oxide, holmium oxide, indium oxide, lanthanum oxide, manganese oxide, lutetium oxide, neodymium oxide, praseodymium oxide, plutonium oxide, samarium oxide, terbium oxide, thallium oxide, thulium oxide, yttrium oxide and ytterbium oxide over the entire exposed surface of the intermediate article, and, a ceramic superconductor. 5 figures.

  14. Reducing interface recombination for Cu(In,Ga)Se{sub 2} by atomic layer deposited buffer layers

    SciTech Connect

    Hultqvist, Adam; Bent, Stacey F.; Li, Jian V.; Kuciauskas, Darius; Dippo, Patricia; Contreras, Miguel A.; Levi, Dean H.

    2015-07-20

    Partial CuInGaSe{sub 2} (CIGS) solar cell stacks with different atomic layer deposited buffer layers and pretreatments were analyzed by photoluminescence (PL) and capacitance voltage (CV) measurements to investigate the buffer layer/CIGS interface. Atomic layer deposited ZnS, ZnO, and SnO{sub x} buffer layers were compared with chemical bath deposited CdS buffer layers. Band bending, charge density, and interface state density were extracted from the CV measurement using an analysis technique new to CIGS. The surface recombination velocity calculated from the density of interface traps for a ZnS/CIGS stack shows a remarkably low value of 810 cm/s, approaching the range of single crystalline II–VI systems. Both the PL spectra and its lifetime depend on the buffer layer; thus, these measurements are not only sensitive to the absorber but also to the absorber/buffer layer system. Pretreatment of the CIGS prior to the buffer layer deposition plays a significant role on the electrical properties for the same buffer layer/CIGS stack, further illuminating the importance of good interface formation. Finally, ZnS is found to be the best performing buffer layer in this study, especially if the CIGS surface is pretreated with potassium cyanide.

  15. Reducing interface recombination for Cu(In,Ga)Se 2 by atomic layer deposited buffer layers

    SciTech Connect

    Hultqvist, Adam; Li, Jian V.; Kuciauskas, Darius; Dippo, Patricia; Contreras, Miguel A.; Levi, Dean H.; Bent, Stacey F.

    2015-07-20

    Partial CuInGaSe2 (CIGS) solar cell stacks with different atomic layer deposited buffer layers and pretreatments were analyzed by photoluminescence (PL) and capacitance voltage (CV) measurements to investigate the buffer layer/CIGS interface. Atomic layer deposited ZnS, ZnO, and SnOx buffer layers were compared with chemical bath deposited CdS buffer layers. Band bending, charge density, and interface state density were extracted from the CV measurement using an analysis technique new to CIGS. The surface recombination velocity calculated from the density of interface traps for a ZnS/CIGS stack shows a remarkably low value of 810 cm/s, approaching the range of single crystalline II-VI systems. Both the PL spectra and its lifetime depend on the buffer layer; thus, these measurements are not only sensitive to the absorber but also to the absorber/buffer layer system. Pretreatment of the CIGS prior to the buffer layer deposition plays a significant role on the electrical properties for the same buffer layer/CIGS stack, further illuminating the importance of good interface formation. Finally, ZnS is found to be the best performing buffer layer in this study, especially if the CIGS surface is pretreated with potassium cyanide.

  16. The impact of substrate nitridation temperature and buffer design and synthesis on the polarity of GaN epitaxial films

    NASA Astrophysics Data System (ADS)

    Namkoong, Gon; Alan Doolittle, W.; Brown, April S.; Losurdo, Maria; Giangregorio, Maria M.; Bruno, Giovanni

    2003-05-01

    The polarity of GaN epitaxial layers grown on GaN and AlN buffer layers was investigated and found to be dependent on nitridation temperature over the range of 200-700°C. When low temperature (LT), 500°C, GaN buffer layers are used, GaN epitaxial layers grown on 200°C nitrided sapphire have a higher density of N-polar inversion domains. However, a high density of dislocation pits was observed on GaN epitaxial layers based on AFM morphology when GaN epitaxial layers were grown on LT GaN buffer of 700°C nitrided sapphire substrate. With high temperature (HT), 850°C, AlN buffer layers, the density of N-polar inversion domains in GaN epitaxial layers depends on the thickness of AlN buffer layer. The structural quality of Ga-polar GaN epitaxial layer is dramatically improved when LT GaN and HT AlN buffer layers are combined with an optimized annealing time. The measured full-widths at half-maximum of (0 0 0 2) symmetric and (1 0 .4) asymmetric reflections are 68 and 246 arcsec, respectively, for 1.0 μm GaN epitaxial layers. The results presented here can be implemented to produce low dislocation density, single Ga-polar GaN epitaxial layers.

  17. Effect of the growth temperature and the AlN mole fraction on In incorporation and properties of quaternary III-nitride layers grown by molecular beam epitaxy

    SciTech Connect

    Fernandez-Garrido, S.; Pereiro, J.; Munoz, E.; Calleja, E.; Gago, R.; Bertram, F.; Christen, J.; Luna, E.; Trampert, A.

    2008-10-15

    Indium incorporation into wurtzite (0001)-oriented In{sub x}Al{sub y}Ga{sub 1-x-y}N layers grown by plasma-assisted molecular beam epitaxy was studied as a function of the growth temperature (565-635 deg. C) and the AlN mole fraction (0.01layer stoichiometry was determined by Rutherford backscattering spectrometry (RBS). RBS shows that indium incorporation decreased continuously with increasing growth temperature due to thermally enhanced dissociation of In-N bonds and for increasing AlN mole fractions. High resolution x-ray diffraction and transmission electron microscopy (TEM) measurements did not show evidence of phase separation. The mosaicity of the quaternary layers was found to be mainly determined by the growth temperature and independent on alloy composition within the range studied. However, depending on the AlN mole fraction, nanometer-sized composition fluctuations were detected by TEM. Photoluminescence spectra showed a single broad emission at room temperature, with energy and bandwidth S- and W-shaped temperature dependences typical of exciton localization by alloy inhomogeneities. Cathodoluminescence measurements demonstrated that the alloy inhomogeneities, responsible of exciton localization, occur on a lateral length scale below 150 nm, which is corroborated by TEM.

  18. Influence of AlN thickness on AlGaN epilayer grown by MOCVD

    NASA Astrophysics Data System (ADS)

    Jayasakthi, M.; Juillaguet, S.; Peyre, H.; Konczewicz, L.; Baskar, K.; Contreras, S.

    2016-10-01

    AlGaN/AlN layers were grown by metalorganic chemical vapor deposition (MOCVD) on sapphire substrates. The AlN buffer thickness was varied from 400 nm to 800 nm. The AlGaN layer thickness was 1000 nm. The crystalline quality, thickness and composition of AlGaN were determined using high resolution X-ray diffraction (HRXRD). The threading dislocation density (TDD) was found to decrease with increase of AlN layer thickness. Reciprocal space mapping (RSM) was used to estimate the strain and relaxation between AlGaN and AlN. The optical properties of AlGaN layers were investigated by temperature dependent photoluminescence (PL). PL intensities of AlGaN layers increases with increasing the AlN thickness. The surface morphology of AlGaN was studied by atomic force microscopy (AFM). Root mean square (RMS) roughness values were found to be decreased while increase of AlN thickness.

  19. Evaluation of bi-layer TaSix absorber on buffer for EUV mask

    NASA Astrophysics Data System (ADS)

    Kanayama, Koichiro; Tamura, Shinpei; Nishiyama, Yasushi; Kawashita, Masashi; Matsuo, Tadashi; Tamura, Akira; Nagashige, Susumu; Hiruma, Kenji; Goo, Doohoon; Nishiyama, Iwao

    2006-10-01

    We evaluated TaSix-based bi-layer absorber on ZrSi-based buffer for EUV mask, especially considering the possibility of ZrSi-based film as a combined buffer and capping layer. Since ZrSi-based film has both high dry-etching resistance and EUV transparency, it has potentiality to work as a combined capping and buffer layer. AFM machining repair of bi-layer TaSix absorber on ZrSi-based buffer can be performed to good profile. Printing evaluation showed that over-repair into buffer layer did not affect significantly to wafer CD. FIB (10keV) repair of bi-layer TaSix absorber on ZrSi-based buffer needs improvement for side-wall profile and distinguishable evaluation from implanted Ga + effect in more detail. Effect of FIB (10keV) scan with ordinary repair process seems to be at least smaller than 10%.

  20. Enhanced surface patterning of chalcogenide glass via imprinting process using a buffer layer

    NASA Astrophysics Data System (ADS)

    Jin, Byeong Kyou; Choi, Duk-Yong; Chung, Woon Jin; Choi, Yong Gyu

    2017-09-01

    In an effort to enhance transcriptability of quasi-three-dimensional patterns present in silicon stamp onto the surface of 'bulk' chalcogenide glass, a buffer layer was introduced during the replication process via imprinting. Dissimilar patterns with diverse depths along the surface normal direction were imprinted with or without the buffer layer, and the resulting patterns on the glass surface were compared with regard to the transcription quality in both the lateral and vertical directions. After assessing the processing conditions appropriate for imprinting bulk As2S3 glass especially in terms of temperature and duration, candidate materials suitable for the buffer layer were screened: Commercially available polydimethylsiloxane was then chosen, and impact of this buffer layer was elucidated. The imprinted patterns turned out to become more uniform over large surface areas when the buffer layer was inserted. This finding confirmed that the use of buffer layer conspicuously enhanced the transcriptability of imprinting process for bulk chalcogenide glass.

  1. Structural evolution of Ag-Cu nano-alloys confined between AlN nano-layers upon fast heating.

    PubMed

    Janczak-Rusch, J; Chiodi, M; Cancellieri, C; Moszner, F; Hauert, R; Pigozzi, G; Jeurgens, L P H

    2015-11-14

    The structural evolution of a Ag-Cu/AlN nano-multilayer (NML), as prepared by magnetron-sputtering on a α-Al2O3 substrate, was monitored during fast heating by real-time in situ XRD analysis (at the synchrotron), as well as by ex situ microstructural analysis using SEM, XPS and in-house XRD. The as-deposited NML is constituted of alternating nano-layers (thickness ≈ 10 nm) of a chemically inert AlN barrier and a eutectic Ag-Cu(40at%) nano-alloy. The nano-alloy in the as-deposited state is composed of a fcc matrix of Ag nano-grains (≈6 nm), which are supersaturated by Cu, and some smaller embedded Cu rich nano-grains (≈4 nm). Heating up to 265 °C activates segregation of Cu out of the supersaturated Ag nano-grains phase, thus initiating phase separation. At T > 265 °C, the phase-separated Cu metal partially migrates to the top NML surface, thereby relaxing thermally-accumulated compressive stresses in the confined alloy nano-layers and facilitating grain coarsening of (still confined) phase-separated nano-crystallites. Further heating and annealing up to 420 °C results in complete phase separation, forming extended Ag and Cu domains with well-defined coherent Ag/AlN interfaces. The observed outflow of Cu well below the eutectic melting point of the bulk Ag-Cu alloy might provide new pathways for designing low-temperature nano-structured brazing materials.

  2. Characterization of Cu buffer layers for growth of L10-FeNi thin films

    NASA Astrophysics Data System (ADS)

    Mizuguchi, M.; Sekiya, S.; Takanashi, K.

    2010-05-01

    A Cu(001) layer was fabricated on a Au(001) layer to investigate the use of Cu as a buffer layer for growing L10-FeNi thin films. The epitaxial growth of a Cu buffer layer was observed using reflection high-energy electron diffraction. The flatness of the layer improved drastically with an increase in the substrate temperature although the layer was an alloy (AuCu3). An FeNi thin film was epitaxially grown on the AuCu3 buffer layer by alternate monatomic layer deposition and the formation of an L10-FeNi ordered alloy was expected. The AuCu3 buffer layer is thus a promising candidate material for the growth of L10-FeNi thin films.

  3. Superconducting composite with multilayer patterns and multiple buffer layers

    DOEpatents

    Wu, Xin D.; Muenchausen, Ross E.

    1993-01-01

    An article of manufacture including a substrate, a patterned interlayer of a material selected from the group consisting of magnesium oxide, barium-titanium oxide or barium-zirconium oxide, the patterned interlayer material overcoated with a secondary interlayer material of yttria-stabilized zirconia or magnesium-aluminum oxide, upon the surface of the substrate whereby an intermediate article with an exposed surface of both the overcoated patterned interlayer and the substrate is formed, a coating of a buffer layer selected from the group consisting of cerium oxide, yttrium oxide, curium oxide, dysprosium oxide, erbium oxide, europium oxide, iron oxide, gadolinium oxide, holmium oxide, indium oxide, lanthanum oxide, manganese oxide, lutetium oxide, neodymium oxide, praseodymium oxide, plutonium oxide, samarium oxide, terbium oxide, thallium oxide, thulium oxide, yttrium oxide and ytterbium oxide over the entire exposed surface of the intermediate article, and, a ceramic superco n FIELD OF THE INVENTION The present invention relates to the field of superconducting articles having two distinct regions of superconductive material with differing in-plane orientations whereby the conductivity across the boundary between the two regions can be tailored. This invention is the result of a contract with the Department of Energy (Contract No. W-7405-ENG-36).

  4. Effect of Oxide Buffer Layer on the Thermochromic Properties of VO2 Thin Films

    NASA Astrophysics Data System (ADS)

    Koo, Hyun; Xu, Lu; Ko, Kyeong-Eun; Ahn, Seunghyun; Chang, Se-Hong; Park, Chan

    2013-12-01

    VO2 thin films were deposited on soda lime glass substrates with ZnO, TiO2, SnO2, and CeO2 thin films applied as buffer layers between the VO2 films and the substrates in order to investigate the effect of buffer layer on the formation and the thermochromic properties of VO2 film. Buffer layers with thicknesses over 50 nm were found to affect the formation of VO2 film, which was confirmed by XRD spectra. By using ZnO, TiO2, and SnO2 buffer layers, monoclinic VO2 (VO2(M)) film was successfully fabricated on soda lime glass at 370 °C. On the contrary, films of VO2(B), which is known to have no phase transition near room temperature, were formed rather than VO2(M) when the film was deposited on CeO2 buffer layer at the same film deposition temperature. The excellent thermochromic properties of the films deposited on ZnO, TiO2, and SnO2 buffer layers were confirmed from the temperature dependence of electrical resistivity from room temperature to 80 °C. Especially, due to the tendency of ZnO thin film to grow with a high degree of preferred orientation on soda lime glass at low temperature, the VO2 film deposited on ZnO buffer layer exhibits the best thermochromic properties compared to those on other buffer layer materials used in this study. These results suggest that deposition of VO2 films on soda lime glass at low temperature with excellent thermochromic properties can be achieved by considering the buffer layer material having structural similarity with VO2. Moreover, the degree of crystallization of buffer layer is also related with that of VO2 film, and thus ZnO can be one of the most effective buffer layer materials.

  5. Effect of a cathode buffer layer on the stability of organic solar cells

    NASA Astrophysics Data System (ADS)

    Wang, Danbei; Zeng, Wenjin; Chen, Shilin; Su, Xiaodan; Wang, Jin; Zhang, Hongmei

    2015-08-01

    We present the effect of a cathode buffer layer on the performance and stability of organic photovoltaics (OPVs) based on a blend of poly(3-hexylthiophene) (P3HT) and [6,6]-phenyl C61-butyric acid methyl ester (PCBM). Six kinds of cathode buffer layers, i.e. lithium fluoride, sodium chloride, NaCl/Mg, tris-(8-hydroxy-quinoline) aluminum, bathocuproine and 1,3,5-tris(2-N-phenylbenzimidazolyl)benzene, were inserted between the photoactive layer and an Al cathode, which played a dominant role in the device’s performance. Devices with the cathode buffer layers above exhibited improved performance. The degradation of these devices with encapsulation was further investigated in an inert atmosphere. The results indicated that devices with inorganic cathode buffer layers exhibited better stability than those with organic cathode buffer layers.

  6. The structure of crystallographic damage in GaN formed during rare earth ion implantation with and without an ultrathin AlN capping layer

    NASA Astrophysics Data System (ADS)

    Gloux, F.; Ruterana, P.; Wojtowicz, T.; Lorenz, K.; Alves, E.

    2006-10-01

    The crystallographic nature of the damage created in GaN implanted by rare earth ions at 300 keV and room temperature has been investigated by transmission electron microscopy versus the fluence, from 7×10 13 to 2×10 16 at/cm 2, using Er, Eu or Tm ions. The density of point defect clusters was seen to increase with the fluence. From about 3×10 15 at/cm 2, a highly disordered 'nanocrystalline layer' (NL) appears on the GaN surface. Its structure exhibits a mixture of voids and misoriented nanocrystallites. Basal stacking faults (BSFs) of I 1, E and I 2 types have been noticed from the lowest fluence, they are I 1 in the majority. Their density increases and saturates when the NL is observed. Many prismatic stacking faults (PSFs) with Drum atomic configuration have been identified. The I 1 BSFs are shown to propagate easily through GaN by folding from basal to prismatic planes thanks to the PSFs. When implanting through a 10 nm AlN cap, the NL threshold goes up to about 3×10 16 at/cm 2. The AlN cap plays a protective role against the dissociation of the GaN up to the highest fluences. The flat surface after implantation and the absence of SFs in the AlN cap indicate its high resistance to the damage formation.

  7. Buffer layer investigations on MFIS capacitors consisting of ferroelectric poly[vinylidene fluoride trifluoroethylene

    NASA Astrophysics Data System (ADS)

    Henkel, K.; Seime, B.; Paloumpa, I.; Müller, K.; Schmeißer, D.

    2010-02-01

    In this paper we present capacitance-voltage (CV) measurements on metal-ferroelectric-insulator-semiconductor (MFIS) capacitors with poly[vinylidene fluoride trifluoroethylene] (P[VDF/TrFE] as ferroelectric layer and SiO2, Al2O3 and HfO2 as buffering insulator layer. In order to discuss our data in a quantitative manner we perform fits to the data based on a model proposed by Miller and McWorther. The improvement of the polarization values and subsequently its effect on the hysteresis of the CV curve by the successive shrinking of the buffer layer thickness and the following choice of a high-k buffer material is demonstrated. Our data underline that a saturated polarization of P[VDF/TrFE] cannot be controlled with a SiO2 buffer layer and the insertion of a high-k buffer layer is essential for further improvements of the characteristics of MFIS stacks.

  8. Method of deforming a biaxially textured buffer layer on a textured metallic substrate and articles therefrom

    DOEpatents

    Lee, Dominic F.; Kroeger, Donald M.; Goyal, Amit

    2000-01-01

    The present invention provides methods and biaxially textured articles having a deformed epitaxial layer formed therefrom for use with high temperature superconductors, photovoltaic, ferroelectric, or optical devices. A buffer layer is epitaxially deposited onto biaxially-textured substrates and then mechanically deformed. The deformation process minimizes or eliminates grooves, or other irregularities, formed on the buffer layer while maintaining the biaxial texture of the buffer layer. Advantageously, the biaxial texture of the buffer layer is not altered during subsequent heat treatments of the deformed buffer. The present invention provides mechanical densification procedures which can be incorporated into the processing of superconducting films through the powder deposit or precursor approaches without incurring unfavorable high-angle grain boundaries.

  9. Simulation study on single event burnout in linear doping buffer layer engineered power VDMOSFET

    NASA Astrophysics Data System (ADS)

    Yunpeng, Jia; Hongyuan, Su; Rui, Jin; Dongqing, Hu; Yu, Wu

    2016-02-01

    The addition of a buffer layer can improve the device's secondary breakdown voltage, thus, improving the single event burnout (SEB) threshold voltage. In this paper, an N type linear doping buffer layer is proposed. According to quasi-stationary avalanche simulation and heavy ion beam simulation, the results show that an optimized linear doping buffer layer is critical. As SEB is induced by heavy ions impacting, the electric field of an optimized linear doping buffer device is much lower than that with an optimized constant doping buffer layer at a given buffer layer thickness and the same biasing voltages. Secondary breakdown voltage and the parasitic bipolar turn-on current are much higher than those with the optimized constant doping buffer layer. So the linear buffer layer is more advantageous to improving the device's SEB performance. Project supported by the National Natural Science Foundation of China (No. 61176071), the Doctoral Fund of Ministry of Education of China (No. 20111103120016), and the Science and Technology Program of State Grid Corporation of China (No. SGRI-WD-71-13-006).

  10. Method of depositing an electrically conductive oxide buffer layer on a textured substrate and articles formed therefrom

    DOEpatents

    Paranthaman, M. Parans; Aytug, Tolga; Christen, David K.

    2005-10-18

    An article with an improved buffer layer architecture includes a substrate having a textured metal surface, and an electrically conductive lanthanum metal oxide epitaxial buffer layer on the surface of the substrate. The article can also include an epitaxial superconducting layer deposited on the epitaxial buffer layer. An epitaxial capping layer can be placed between the epitaxial buffer layer and the superconducting layer. A method for preparing an epitaxial article includes providing a substrate with a metal surface and depositing on the metal surface a lanthanum metal oxide epitaxial buffer layer. The method can further include depositing a superconducting layer on the epitaxial buffer layer, and depositing an epitaxial capping layer between the epitaxial buffer layer and the superconducting layer.

  11. Method of depositing an electrically conductive oxide buffer layer on a textured substrate and articles formed therefrom

    DOEpatents

    Paranthaman, M. Parans; Aytug, Tolga; Christen, David K.

    2003-09-09

    An article with an improved buffer layer architecture includes a substrate having a textured metal surface, and an electrically conductive lanthanum metal oxide epitaxial buffer layer on the surface of the substrate. The article can also include an epitaxial superconducting layer deposited on the epitaxial buffer layer. An epitaxial capping layer can be placed between the epitaxial buffer layer and the superconducting layer. A method for preparing an epitaxial article includes providing a substrate with a metal surface and depositing on the metal surface a lanthanum metal oxide epitaxial buffer layer. The method can further include depositing a superconducting layer on the epitaxial buffer layer, and depositing an epitaxial capping layer between the epitaxial buffer layer and the superconducting layer.

  12. Improvement in the Crystalline Quality of Semipolar AlN(1102) Films by Using ZnO Substrates with Self-Organized Nanostripes

    NASA Astrophysics Data System (ADS)

    Ueno, Kohei; Kobayashi, Atsushi; Ohta, Jitsuo; Fujioka, Hiroshi

    2010-04-01

    We have found that self-organized nanostripes structures can be formed on the surface of ZnO(1102) substrates by annealing in the air, and high quality semipolar AlN can be grown on such substrates by growing a room temperature epitaxial AlN buffer layer. The full width at half maximum value of the X-ray rocking curve for AlN 1102 was as low as 500 arcsec. The observed tilt of the AlN(1102) layer grown on ZnO(1102) with self-organized nanostripes is smaller than that on as-received ZnO(1102), indicating that the nanostripes structure suppresses the introduction of misfit dislocations at the heterointerface probably due to the reduced stress field around the nanostripes. This reduction in the density of the misfit dislocations is probably responsible for the improvement in crystalline quality.

  13. Microstructures of YBa2Cu3Oy Layers Deposited on Conductive Layer-Buffered Metal Tapes

    NASA Astrophysics Data System (ADS)

    Ichinose, Ataru; Hashimoto, Masayuki; Horii, Shigeru; Doi, Toshiya

    REBa2Cu3Oy (REBCO; RE: rare-earth elements)-coated conductors (CCs) have high potential for use in superconducting devices. In particular, REBCO CCs are useful for superconducting devices working at relatively high temperatures near 77 K. The important issues in their applications are high performance, reliability and low cost. To date, sufficient performance for some applications has almost been achieved by considerable efforts. The establishment of the reliability of superconducting devices is under way at present. The issue of low cost must be resolved to realize the application of superconducting devices in the near future. Therefore, we have attempted several ways to reduce the cost of REBCO CCs. The coated conductors using a Nb-doped SrTiO3 buffer layer and Ni-plated Cu and stainless steel laminate metal tapes have recently been developed to eliminate the use of electric stabilization layers of Cu and Ag, which are expected to reduce the material cost. Good superconducting properties are obtained at 77 K. The critical current density (JC) at 77 K under a magnetic self-field is determined to be more than 2x106 A/cm2. The microstructures of the CCs are analyzed by transmission electron microscopy to obtain a much higher quality. By microscopic structure analysis, an overgrowth of the buffer layer is observed at a grain boundary of the metal substrate, which is one of the reasons for the high JC.

  14. Method for making MgO buffer layers on rolled nickel or copper as superconductor substrates

    DOEpatents

    Paranthaman, Mariappan; Goyal, Amit; Kroeger, Donald M.; List, III, Frederic A.

    2002-01-01

    Buffer layer architectures are epitaxially deposited on biaxially-textured rolled-Ni and/or Cu substrates for high current conductors, and more particularly buffer layer architectures such as MgO/Ag/Pt/Ni, MgO/Ag/Pd/Ni, MgO/Ag/Ni, MgO/Ag/Pd/Cu, MgO/Ag/Pt/Cu, and MgO/Ag/Cu. Techniques used to deposit these buffer layers include electron beam evaporation, thermal evaporation, rf magnetron sputtering, pulsed laser deposition, metal-organic chemical vapor deposition (MOCVD), combustion CVD, and spray pyrolysis.

  15. MgO buffer layers on rolled nickel or copper as superconductor substrates

    DOEpatents

    Paranthaman, Mariappan; Goyal, Amit; Kroeger, Donald M.; List, III, Frederic A.

    2001-01-01

    Buffer layer architectures are epitaxially deposited on biaxially-textured rolled-Ni and/or Cu substrates for high current conductors, and more particularly buffer layer architectures such as MgO/Ag/Pt/Ni, MgO/Ag/Pd/Ni, MgO/Ag/Ni, MgO/Ag/Pd/Cu, MgO/Ag/Pt/Cu, and MgO/Ag/Cu. Techniques used to deposit these buffer layers include electron beam evaporation, thermal evaporation, rf magnetron sputtering, pulsed laser deposition, metal-organic chemical vapor deposition (MOCVD), combustion CVD, and spray pyrolysis.

  16. Growth Optimization of YBa2NbO6 Buffer Layers (Postprint)

    DTIC Science & Technology

    2012-02-01

    single crystals, and IBAD MgO buffered Inconel substrates has been investigated. X-ray diffraction confirms the epitaxial growth of highly h00 oriented...YBNO thin films on single crystal substrates and IBAD MgO buffered Inconel substrates. The best average surface roughness of the YBNO films...diffraction, crystal, buffered, inconel , epitaxial, films, substrates, layers, growth, investigated, sufficient, preliminary, critical 16. SECURITY

  17. Efficient organic photovoltaic devices using a combination of exciton blocking layer and anodic buffer layer

    NASA Astrophysics Data System (ADS)

    Chan, M. Y.; Lee, C. S.; Lai, S. L.; Fung, M. K.; Wong, F. L.; Sun, H. Y.; Lau, K. M.; Lee, S. T.

    2006-11-01

    By using bathophenanthroline (BPhen) as an exciton blocking layer (EBL) at the organic/cathode contact of a standard copper phthalocyanine/C60 organic photovoltaic (OPV) device, power conversion efficiency was substantially increased from 0.86% to 2.64%. The BPhen-based devices showed a 45% increase in power conversion efficiency over that of an equivalent device with an EBL of bathocuproine. The performance improvement was analyzed in terms of the electron energy levels, optical transparencies and electron mobilities of the two EBLs. Based on these results, the roles of and requirements for an effective EBL were discussed. Combining the use of BPhen and a WO3 anodic buffer layer further increased the power conversion efficiency of the OPV device to 3.33%.

  18. The effect of AlN nucleation temperature on inverted pyramid defects in GaN layers grown on 200 mm silicon wafers

    NASA Astrophysics Data System (ADS)

    Charles, Matthew; Baines, Yannick; Bos, Sandra; Escoffier, René; Garnier, Gennie; Kanyandekwe, Joël; Lebreton, Julie; Vandendaele, William

    2017-04-01

    We have examined 200 mm GaN on silicon wafers, while varying the AlN nucleation temperature, and have found that higher temperatures result in a more convex bow on the wafers. In addition, by performing full wafer defect mapping, we have found that a higher nucleation temperature results in a higher density of inverted pyramid defects, which have previously been found to reduce the breakdown voltage of GaN on silicon layers. We have performed electrical measurements on a wafer with the lowest temperature AlN layer, which is still within our bow specification, and which therefore has the lowest density of inverted pyramid defects. This wafer showed the same leakage current density for both very small and very large test structures (2×10-3 and 18.7 mm2 respectively), with all but one of our large structures maintaining a breakdown voltage greater than 700 V. This is a very promising result for high yield of devices on 200 mm GaN on silicon wafers.

  19. Effects of Sputtering Parameters on AlN Film Growth on Flexible Hastelloy Tapes by Two-Step Deposition Technique.

    PubMed

    Peng, Bin; Gong, Dongdong; Zhang, Wanli; Jiang, Jianying; Shu, Lin; Zhang, Yahui

    2016-08-10

    AlN thin films were deposited on flexible Hastelloy tapes and Si (100) substrate by middle-frequency magnetron sputtering. A layer of Y₂O₃ films was used as a buffer layer for the Hastelloy tapes. A two-step deposition technique was used to prepare the AlN films. The effects of deposition parameters such as sputtering power, N₂/Ar flow rate and sputtering pressure on the microstructure of the AlN thin films were systematically investigated. The results show that the dependency of the full width at half maximum (FWHM) of AlN/Y₂O₃/Hastelloy on the sputtering parameters is similar to that of AlN/Si (100). The FWHM of the AlN (002) peak of the prepared AlN films decreases with increasing sputtering power. The FWHM decreases with the increase of the N₂/Ar flow rate or sputtering pressure, and increases with the further increase of the N₂/Ar flow rate or sputtering pressure. The FWHM of the AlN/Y₂O₃/Hastelloy prepared under optimized parameters is only 3.7° and its root mean square (RMS) roughness is 5.46 nm. Based on the experimental results, the growth mechanism of AlN thin films prepared by the two-step deposition process was explored. This work would assist us in understanding the AlN film's growth mechanism of the two-step deposition process, preparing highly c-axis-oriented AlN films on flexible metal tapes and developing flexible surface acoustic wave (SAW) sensors from an application perspective.

  20. Effects of Sputtering Parameters on AlN Film Growth on Flexible Hastelloy Tapes by Two-Step Deposition Technique

    PubMed Central

    Peng, Bin; Gong, Dongdong; Zhang, Wanli; Jiang, Jianying; Shu, Lin; Zhang, Yahui

    2016-01-01

    AlN thin films were deposited on flexible Hastelloy tapes and Si (100) substrate by middle-frequency magnetron sputtering. A layer of Y2O3 films was used as a buffer layer for the Hastelloy tapes. A two-step deposition technique was used to prepare the AlN films. The effects of deposition parameters such as sputtering power, N2/Ar flow rate and sputtering pressure on the microstructure of the AlN thin films were systematically investigated. The results show that the dependency of the full width at half maximum (FWHM) of AlN/Y2O3/Hastelloy on the sputtering parameters is similar to that of AlN/Si (100). The FWHM of the AlN (002) peak of the prepared AlN films decreases with increasing sputtering power. The FWHM decreases with the increase of the N2/Ar flow rate or sputtering pressure, and increases with the further increase of the N2/Ar flow rate or sputtering pressure. The FWHM of the AlN/Y2O3/Hastelloy prepared under optimized parameters is only 3.7° and its root mean square (RMS) roughness is 5.46 nm. Based on the experimental results, the growth mechanism of AlN thin films prepared by the two-step deposition process was explored. This work would assist us in understanding the AlN film’s growth mechanism of the two-step deposition process, preparing highly c-axis–oriented AlN films on flexible metal tapes and developing flexible surface acoustic wave (SAW) sensors from an application perspective. PMID:28773806

  1. GaAs buffer layer technique for vertical nanowire growth on Si substrate

    SciTech Connect

    Xu, Xiaoqing Parizi, Kokab B.; Huo, Yijie; Kang, Yangsen; Philip Wong, H.-S.; Li, Yang

    2014-02-24

    Gold catalyzed vapor-liquid-solid method is widely applied to III–V nanowire (NW) growth on Si substrate. However, the easy oxidation of Si, possible Si contamination in the NWs, high defect density in the NWs, and high sensitivity of the NW morphology to growth conditions largely limit its controllability. In this work, we developed a buffer layer technique by introducing a GaAs thin film with predefined polarity as a template. It is found that samples grown on these buffer layers all have high vertical NW yields in general, due to the single-orientation of the buffer layers. Low temperature buffer with smoother surface leads to highest yield of vertical NWs, while high temperature (HT) buffer with better crystallinity results in perfect NW quality. The defect-free property we observed here is very promising for optoelectronic device applications based on GaAs NW. Moreover, the buffer layers can eliminate Si contamination by preventing Si-Au alloy formation and by increasing the thickness of the Si diffusion barrier, thus providing more flexibility to vertical NW growth. The buffer layer technique we demonstrated here could be easily extended to other III-V on Si system for electronic and photonic applications.

  2. Critical CuI buffer layer surface density for organic molecular crystal orientation change

    SciTech Connect

    Ahn, Kwangseok; Kim, Jong Beom; Lee, Dong Ryeol; Kim, Hyo Jung; Lee, Hyun Hwi

    2015-01-21

    We have determined the critical surface density of the CuI buffer layer inserted to change the preferred orientation of copper phthalocyanine (CuPc) crystals grown on the buffer layer. X-ray reflectivity measurements were performed to obtain the density profiles of the buffer layers and out-of-plane and 2D grazing-incidence X-ray diffraction measurements were performed to determine the preferred orientations of the molecular crystals. Remarkably, it was found that the preferred orientation of the CuPc film is completely changed from edge-on (1 0 0) to face-on (1 1 −2) by a CuI buffer layer with a very low surface density, so low that a large proportion of the substrate surface is bare.

  3. Pulsed Laser Deposition of YBCO With Yttrium Oxide Buffer Layers (Postprint)

    DTIC Science & Technology

    2012-02-01

    AFRL-RZ-WP-TP-2012-0092 PULSED LASER DEPOSITION OF YBCO WITH YTTRIUM OXIDE BUFFER LAYERS (POSTPRINT) Paul N. Barnes, Timothy J. Haugan...Paper Postprint 01 January 2002 – 01 January 2004 4. TITLE AND SUBTITLE PULSED LASER DEPOSITION OF YBCO WITH YTTRIUM OXIDE BUFFER LAYERS (POSTPRINT...Textured metallic substrate based HTS coated conductors with the YBCO /CeO2/YSZ/CeO2/Ni architecture have already been shown to exhibit high current

  4. AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition

    NASA Astrophysics Data System (ADS)

    Tzou, An-Jye; Chu, Kuo-Hsiung; Lin, I.-Feng; Østreng, Erik; Fang, Yung-Sheng; Wu, Xiao-Peng; Wu, Bo-Wei; Shen, Chang-Hong; Shieh, Jia-Ming; Yeh, Wen-Kuan; Chang, Chun-Yen; Kuo, Hao-Chung

    2017-04-01

    We report a low current collapse GaN-based high electron mobility transistor (HEMT) with an excellent thermal stability at 150 °C. The AlN was grown by N2-based plasma enhanced atomic layer deposition (PEALD) and shown a refractive index of 1.94 at 633 nm of wavelength. Prior to deposit AlN on III-nitrides, the H2/NH3 plasma pre-treatment led to remove the native gallium oxide. The X-ray photoelectron spectroscopy (XPS) spectroscopy confirmed that the native oxide can be effectively decomposed by hydrogen plasma. Following the in situ ALD-AlN passivation, the surface traps can be eliminated and corresponding to a 22.1% of current collapse with quiescent drain bias ( V DSQ) at 40 V. Furthermore, the high temperature measurement exhibited a shift-free threshold voltage ( V th), corresponding to a 40.2% of current collapse at 150 °C. The thermal stable HEMT enabled a breakdown voltage (BV) to 687 V at high temperature, promising a good thermal reliability under high power operation.

  5. Organic Photovoltaic Cells with Improved Performance Using Bathophenanthroline as a Buffer Layer

    NASA Astrophysics Data System (ADS)

    Wang, Na-na; Yu, Jun-sheng; Lin, Hui; Jiang, Ya-dong

    2010-02-01

    The role of bathophenanthroline (Bphen) as a buffer layer inserted between fullerene (C60) and Ag cathode in organic photovoltaic (OPV) cell was discussed. By introducing Bphen as a buffer layer with thicknes from 0 to 2.5 nm, the power conversion efficiency of the OPV cell based on copper phthalocyanine (CuPc) and C60 was increased from 0.87% to 2.25% under AM 1.5 solar illumination at an intensity of 100 mW/cm2, which was higher than that of bathocuproine used as a buffer layer. The photocurrent-voltage characteristics showed that Bphen effectively improves electron transport through C60 layer into Ag electrode and leads to balance charge carrier transport capability. The influence of Bphen thickness on OPV cells was also investigated. Furthermore, the absorption spectrum shows that an additional Bphen layer enhances the light harvest capability of CuPc/C60.

  6. Matching characteristics of different buffer layers with VO2 thin films

    NASA Astrophysics Data System (ADS)

    Yang, Kai; Zhang, Dongping; Liu, Yi; Guan, Tianrui; Qin, Xiaonan; Zhong, Aihua; Cai, Xingmin; Fan, Ping; Lv, Weizhong

    2016-10-01

    VO2 thin films were fabricated by reactive DC magnetron sputtering on different buffer layers of MgF2, Al2O3 and TiO2, respectively. The crystallinity and orientation relationship, thickness of VO2 thin films, atoms vibrational modes, optical and electrical property, surface morphology of films were characterized by X-ray diffraction, Raman scattering microscopy, step profiler, spectrophotometer, four-probe technique, and scanning electron microscopy, respectively. XRD results investigated that the films have preferential crystalline planes VO2 (011). The crystallinity of VO2 films grown on TiO2 buffer layers are superior to VO2 directly deposited on soda-lime glass. The Raman bands of the VO2 films correspond to an Ag symmetry mode of VO2 (M). The sample prepared on 100nm TiO2 buffer layer appears nanorods structure, and exhibits remarkable solar energy modulation ability as high as 5.82% in full spectrum and 23% in near infrared spectrum. Cross-sectional SEM image of the thin films samples indicate that MgF2 buffer layer has clear interface with VO2 layer. But there are serious interdiffusion phenomenons between Al2O3, TiO2 buffer layer with VO2 layer.

  7. Photovoltaic devices comprising zinc stannate buffer layer and method for making

    DOEpatents

    Wu, Xuanzhi; Sheldon, Peter; Coutts, Timothy J.

    2001-01-01

    A photovoltaic device has a buffer layer zinc stannate Zn.sub.2 SnO.sub.4 disposed between the semiconductor junction structure and the transparent conducting oxide (TCO) layer to prevent formation of localized junctions with the TCO through a thin window semiconductor layer, to prevent shunting through etched grain boundaries of semiconductors, and to relieve stresses and improve adhesion between these layers.

  8. The roles of buffer layer thickness on the properties of the ZnO epitaxial films

    NASA Astrophysics Data System (ADS)

    Tang, Kun; Huang, Shimin; Gu, Shulin; Zhu, Shunming; Ye, Jiandong; Xu, Zhonghua; Zheng, Youdou

    2016-12-01

    In this article, the authors have investigated the optimization of the buffer thickness for obtaining high-quality ZnO epi-films on sapphire substrates. The growth mechanism of the buffers with different thickness has been clearly revealed, including the initial nucleation and vertical growth, the subsequent lateral growth with small grain coalescence, and the final vertical growth along the existing larger grains. Overall, the quality of the buffer improves with increasing thickness except the deformed surface morphology. However, by a full-scale evaluation of the properties for the epi-layers, the quality of the epi-film is briefly determined by the surface morphology of the buffer, rather than the structural, optical, or electrical properties of it. The best quality epi-layer has been grown on the buffer with a smooth surface and well-coalescent grains. Meanwhile, due to the huge lattice mismatch between sapphire and ZnO, dislocations are inevitably formed during the growth of buffers. More importantly, as the film grows thicker, the dislocations may attracting other smaller dislocations and defects to reduce the total line energy and thus result in the formation of V-shape defects, which are connected with the bottom of the threading dislocations in the buffers. The V-defects appear as deep and large hexagonal pits from top view and they may act as electron traps which would affect the free carrier concentration of the epi-layers.

  9. DEFECT SELECTIVE ETCHING OF THICK ALN LAYERS GROWN ON 6H-SIC SEEDS - A TRANSMISSION ELECTRON MICROSCOPY STUDY

    SciTech Connect

    Nyakiti, Luke; Chaudhari, Jharna; Kenik, Edward A; Lu, Peng; Edgar, J H

    2008-01-01

    In the present study, the type and densities of defects in AlN crystals grown on 6H-SiC seeds by the sublimation-recombination method were assessed. The positions of the defects in AlN were first identified by defect selective etching (DSE) in molten NaOH-KOH at 400 C for 2 minutes. Etching produced pits of three different sizes: 1.77 m, 2.35 m , and 2.86 m. The etch pits were either aligned together forming a sub-grain boundary or randomly distributed. The smaller etch pits were either isolated or associated with larger etch pits. After preparing crosssections of the pits by the focused ion beam (FIB) technique, transmission electron microscopy (TEM) was performed to determine which dislocation type (edge, mixed or screw) produced a specific etch pit sizes. Preliminary TEM bright field and dark field study using different zone axes and diffraction vectors indicates an edge dislocation with a Burgers vector 1/3[1120] is associated with the smallest etch pit size.

  10. YSZ buffer layers and YBCO superconducting tapes with enhanced biaxial alignment and properties

    NASA Astrophysics Data System (ADS)

    Savvides, N.; Gnanarajan, S.

    2003-05-01

    Commercial applications of YBa 2Cu 3O 7 (YBCO) superconducting cables require viable and scalable manufacturing processes. We have investigated the evolution of the biaxial alignment of yttria-stabilized zirconia (YSZ) buffer layers with increasing film thickness (50-900 nm) and report on a method of fabricating highly aligned YBCO tapes using a thin epitaxial YSZ buffer layer as template. The method employs magnetron and ion beam assisted deposition (IBAD) techniques followed by epitaxial growth to produce the buffer architectures IBAD-YSZ and epi-YSZ/IBAD-YSZ onto optically polished hastelloy metal substrates. Subsequent in situ deposition of YBCO films is used to determine the biaxial alignment at the surface of the buffer architecture, and to show that 100-200 nm thick epi-YSZ layers suffice to yield YBCO tapes that have enhanced biaxial alignment (Δ φ=9-10°) and high critical current densities: J c(77 K)=(1-2)×10 6 A cm -2 and J c(5 K,1 T)=8×10 6 A cm -2. Atomic force microscopy of the surface microstructure of the YSZ buffer layers and YBCO films reveals some grain coarsening in the epi-YSZ layers compared to the IBAD-YSZ layers while the YBCO tapes show significant outgrowths (∼200 nm) and large grains (800-1200 nm) that are similar to high- Jc YBCO films grown on single crystal MgO(1 0 0) substrates.

  11. Dependence of Magnetic Properties of Co/Pt Multilayers on Deposition Temperature of Pt Buffer Layers

    NASA Astrophysics Data System (ADS)

    Shiomi, Shigeru; Nishimura, Tomotaka; Kobayashi, Tadashi; Masuda, Morio

    1993-04-01

    A 15-nm-thick Pt buffer layer was deposited on a glass slide at temperature Ts(Ptbuf) ranging from 30 to 300°C by e-gun evaporation. Following the cooling in vacuum to ambient temperature, Co and Pt layers have been alternately deposited on it. Very large perpendicular anisotropy and coercivity have been obtained at Ts(Ptbuf) higher than 200°C. The (111) preferred orientation of the Co/Pt multilayer as well as the Pt buffer layer became more pronounced with elevating Ts(Ptbuf), to which the enhancement of perpendicular anisotropy with elevating Ts(Ptbuf) might be ascribable.

  12. Perpendicular magnetization of CoFeB on top of an amorphous buffer layer

    NASA Astrophysics Data System (ADS)

    Kim, Dongseok; Jung, K. Y.; Joo, Sungjung; Jang, Youngjae; Hong, Jinki; Lee, B. C.; You, C. Y.; Cho, J. H.; Kim, M. Y.; Rhie, K.

    2015-01-01

    Perpendicular magnetic anisotropy was observed in sputtered FeZr/CoFeB/MgO multilayers. A thin paramagnetic amorphous FeZr layer was used as a buffer layer and perpendicular anisotropy was obtained by annealing the samples without an external magnetic field. The critical CoFeB thickness for perpendicular anisotropy was 1.8 nm; the anisotropy changes from out-of-plane to in-plane as the CoFeB thickness increases beyond this point. Perpendicular anisotropy was also enhanced when a Ta layer was capped on top of the MgO layer. The amorphous buffer provided better perpendicular anisotropy than previously reported Ta buffer, and it may be applied to perpendicular magnetization MRAM devices where good uniformity of tunnel junctions is required.

  13. High-quality III-nitride films on conductive, transparent (2̅01)-oriented β-Ga2O3 using a GaN buffer layer.

    PubMed

    Muhammed, M M; Roldan, M A; Yamashita, Y; Sahonta, S-L; Ajia, I A; Iizuka, K; Kuramata, A; Humphreys, C J; Roqan, I S

    2016-07-14

    We demonstrate the high structural and optical properties of InxGa1-xN epilayers (0 ≤ x ≤ 23) grown on conductive and transparent (01)-oriented β-Ga2O3 substrates using a low-temperature GaN buffer layer rather than AlN buffer layer, which enhances the quality and stability of the crystals compared to those grown on (100)-oriented β-Ga2O3. Raman maps show that the 2″ wafer is relaxed and uniform. Transmission electron microscopy (TEM) reveals that the dislocation density reduces considerably (~4.8 × 10(7) cm(-2)) at the grain centers. High-resolution TEM analysis demonstrates that most dislocations emerge at an angle with respect to the c-axis, whereas dislocations of the opposite phase form a loop and annihilate each other. The dislocation behavior is due to irregular (01) β-Ga2O3 surface at the interface and distorted buffer layer, followed by relaxed GaN epilayer. Photoluminescence results confirm high optical quality and time-resolved spectroscopy shows that the recombination is governed by bound excitons. We find that a low root-mean-square average (≤1.5 nm) of InxGa1-xN epilayers can be achieved with high optical quality of InxGa1-xN epilayers. We reveal that (01)-oriented β-Ga2O3 substrate has a strong potential for use in large-scale high-quality vertical light emitting device design.

  14. High-quality III-nitride films on conductive, transparent (2̅01)-oriented β-Ga2O3 using a GaN buffer layer

    PubMed Central

    Muhammed, M. M.; Roldan, M. A.; Yamashita, Y.; Sahonta, S.-L.; Ajia, I. A.; Iizuka, K.; Kuramata, A.; Humphreys, C. J.; Roqan, I. S.

    2016-01-01

    We demonstrate the high structural and optical properties of InxGa1−xN epilayers (0 ≤ x ≤ 23) grown on conductive and transparent (01)-oriented β-Ga2O3 substrates using a low-temperature GaN buffer layer rather than AlN buffer layer, which enhances the quality and stability of the crystals compared to those grown on (100)-oriented β-Ga2O3. Raman maps show that the 2″ wafer is relaxed and uniform. Transmission electron microscopy (TEM) reveals that the dislocation density reduces considerably (~4.8 × 107 cm−2) at the grain centers. High-resolution TEM analysis demonstrates that most dislocations emerge at an angle with respect to the c-axis, whereas dislocations of the opposite phase form a loop and annihilate each other. The dislocation behavior is due to irregular (01) β-Ga2O3 surface at the interface and distorted buffer layer, followed by relaxed GaN epilayer. Photoluminescence results confirm high optical quality and time-resolved spectroscopy shows that the recombination is governed by bound excitons. We find that a low root-mean-square average (≤1.5 nm) of InxGa1−xN epilayers can be achieved with high optical quality of InxGa1−xN epilayers. We reveal that (01)-oriented β-Ga2O3 substrate has a strong potential for use in large-scale high-quality vertical light emitting device design. PMID:27412372

  15. High-quality III-nitride films on conductive, transparent (2̅01)-oriented β-Ga2O3 using a GaN buffer layer

    NASA Astrophysics Data System (ADS)

    Muhammed, M. M.; Roldan, M. A.; Yamashita, Y.; Sahonta, S.-L.; Ajia, I. A.; Iizuka, K.; Kuramata, A.; Humphreys, C. J.; Roqan, I. S.

    2016-07-01

    We demonstrate the high structural and optical properties of InxGa1‑xN epilayers (0 ≤ x ≤ 23) grown on conductive and transparent (01)-oriented β-Ga2O3 substrates using a low-temperature GaN buffer layer rather than AlN buffer layer, which enhances the quality and stability of the crystals compared to those grown on (100)-oriented β-Ga2O3. Raman maps show that the 2″ wafer is relaxed and uniform. Transmission electron microscopy (TEM) reveals that the dislocation density reduces considerably (~4.8 × 107 cm‑2) at the grain centers. High-resolution TEM analysis demonstrates that most dislocations emerge at an angle with respect to the c-axis, whereas dislocations of the opposite phase form a loop and annihilate each other. The dislocation behavior is due to irregular (01) β-Ga2O3 surface at the interface and distorted buffer layer, followed by relaxed GaN epilayer. Photoluminescence results confirm high optical quality and time-resolved spectroscopy shows that the recombination is governed by bound excitons. We find that a low root-mean-square average (≤1.5 nm) of InxGa1‑xN epilayers can be achieved with high optical quality of InxGa1‑xN epilayers. We reveal that (01)-oriented β-Ga2O3 substrate has a strong potential for use in large-scale high-quality vertical light emitting device design.

  16. Reaction of dimethylethylamine alane and ammonia on Si(100) during the atomic layer growth of AlN: static SIMS, TPSIMS, and TPD

    NASA Astrophysics Data System (ADS)

    Kuo, J. S.; Rogers, J. W.

    2000-05-01

    Dimethylethylamine alane [DMEAA; AlH 3:N(CH 3) 2(CH 2CH 3)] has been used as an Al source in the chemical vapor deposition of AlN. In the atomic layer growth mode, ammonia and DMEAA interact selectively by nucleophilic displacement. In the first part of this study, the surface adsorption and reaction processes are characterized with static secondary-ion mass spectrometry and temperature-programmed secondary-ion mass spectrometry. The secondary ion emission from DMEAA-covered Si surface shares similar general characteristics with the gas phase cracking pattern. The secondary ion emission spectrum is interpreted according to a unimolecular ion decomposition mechanism and is used as the fingerprint for the presence of molecular DMEAA. During the surface reaction between DMEAA and ammonia, the intensity of the fingerprint peaks diminish, representing the departure of the amine ligand. The thermal stability of DMEAA and its decomposition behavior on Si are also examined.

  17. Growth of InSb on GaAs Using InAlSb Buffer Layers

    SciTech Connect

    BIEFELD, ROBERT M.; PHILLIPS, JAMIE D.

    1999-09-20

    We report the growth of InSb on GaAs using InAlSb buffers of high interest for magnetic field sensors. We have grown samples by metal-organic chemical vapor deposition consisting of {approximately} 0.55 {micro}m thick InSb layers with resistive InAlSb buffers on GaAs substrates with measured electron nobilities of {approximately}40,000 cm{sup 2}/V.s. We have investigated the In{sub 1{minus}x}Al{sub x}Sb buffers for compositions x{le}0.22 and have found that the best results are obtained near x=0.12 due to the tradeoff of buffer layer bandgap and lattice mismatch.

  18. Growth conditions and microstructure of Y 2O 3 buffer layers on cube-textured Ni

    NASA Astrophysics Data System (ADS)

    Ichinose, Ataru; Yang, Chau-Yun; Larbalestier, David C.; Babcock, S. E.; Kikuchi, Akihiro; Tachikawa, Kyoji; Akita, Shirabe

    1999-11-01

    Y 2O 3 films were deposited on cube-textured Ni substrates by electron-beam evaporation as part of a buffer layer study for YBa 2Cu 3O 7- δ (YBCO) coated conductors. Their microstructure was observed by scanning electron microscopy (SEM) and transmission electron microscopy (TEM), and their crystallographic texture and surface roughness evaluated by X-ray diffraction (XRD) and atomic force microscopy (AFM). Previous studies showed the Y 2O 3 surface normal changed from {100} to {111} on decreasing the deposition chamber pressure from 10 -5 to 10 -6 Torr. In this work, 300 nm thick Y 2O 3 buffer layers were deposited at two different deposition chamber pressures, ∼5×10 -4 Torr N 2 and ∼2×10 -5 Torr air, so as to make the {100} orientation dominant. However, the morphology of the Y 2O 3 buffer layers was significantly affected by changing the deposition chamber pressure, the lower pressure buffer layer being denser and smoother than that made at the higher pressure. The Y 2O 3 grains in a 600 nm thick Y 2O 3 buffer layer grown under 2×10 -5 Torr air became larger and more uniformly square as the film grew thicker. The Y 2O 3 grown on thermally grooved Ni deposited at 2×10 -5 Torr air, showed <111>-oriented grains near the grooves. This local imperfection in the texture could lead to significant barriers to supercurrent flow in the YBCO overlayer.

  19. The effect of the carbon nanotube buffer layer on the performance of a Li metal battery.

    PubMed

    Zhang, Ding; Zhou, Yi; Liu, Changhong; Fan, Shoushan

    2016-06-07

    Lithium (Li) metal is one of the most promising candidates as an anode for the next-generation energy storage systems because of its high specific capacity and lowest negative electrochemical potential. But the growth of Li dendrites limits the application of the Li metal battery. In this work, a type of modified Li metal battery with a carbon nanotube (CNT) buffer layer inserted between the separator and the Li metal electrode was reported. The electrochemical results show that the modified batteries have a much better rate capability and cycling performance than the conventional Li metal batteries. The mechanism study by electrochemical impedance spectroscopy reveals that the modified battery has a smaller charge transfer resistance and larger Li ion diffusion coefficient during the deposition process on the Li electrode than the conventional Li metal batteries. Symmetric battery tests show that the interfacial behavior of the Li metal electrode with the buffer layer is more stable than the naked Li metal electrode. The morphological characterization of the CNT buffer layer and Li metal lamina reveals that the CNT buffer layer has restrained the growth of Li dendrites. The CNT buffer layer has great potential to solve the safety problem of the Li metal battery.

  20. Improving performance of inverted organic solar cells using ZTO nanoparticles as cathode buffer layer

    NASA Astrophysics Data System (ADS)

    Tsai, Meng-Yen; Cheng, Wen-Hui; Jeng, Jiann-Shing; Chen, Jen-Sue

    2016-06-01

    In this study, a low-temperature solution-processed zinc tin oxide (ZTO) films are successfully utilized as the cathode buffer layer in the inverted organic P3HT:PCBM bulk heterojunction solar cells. ZTO film cathode buffer layer with an appropriate Sn-doping concentration outperforms the zinc oxide (ZnO) film with an improved power conversion efficiency (1.96% (ZTO film) vs. 1.56% (ZnO film)). Furthermore, ZTO nanoparticles (NPs) are also synthesized via low-temperature solution route and the device with ZTO NPs buffer layer exhibits a significant improvement in device performance to reach a PCE of 2.60%. The crystallinity of the cathode buffer layer plays an influential factor in the performance. From impedance spectroscopy analysis, a correlation between short circuit current (Jsc), carrier life time (τavg) and, thus, PCE is observed. The interplay between composition and crystallinity of the cathode buffer layers is discussed to find their influences on the solar cell performance.

  1. Evaluation of methods for application of epitaxial layers of superconductor and buffer layers

    SciTech Connect

    1997-06-01

    The recent achievements in a number of laboratories of critical currents in excess of 1.0x10{sup 6} amp/cm{sup 2} at 77K in YBCO deposited over suitably textured buffer/substrate composites have stimulated interest in the potential applications of coated conductors at high temperatures and high magnetic fields. As of today, two different approaches for obtaining the textured substrates have been identified. These are: Los Alamos National Laboratory`s (LANL) ion-beam assisted deposition called IBAD, to obtain a highly textured yttria-stabilized zirconia (YSZ) buffer on nickel alloy strips, and Oak Ridge National Laboratory`s (ORNL) rolling assisted, bi-axial texturized substrate option called RABiTS. Similarly, based on the published literature, the available options to form High Temperature Superconductor (HTS) films on metallic, semi-metallic or ceramic substrates can be divided into: physical methods, and non-physical or chemical methods. Under these two major groups, the schemes being proposed consist of: - Sputtering - Electron-Beam Evaporation - Flash Evaporation - Molecular Beam Epitaxy - Laser Ablation - Electrophoresis - Chemical Vapor Deposition (Including Metal-Organic Chemical Vapor Deposition) - Sol-Gel - Metal-Organic Decomposition - Electrodeposition, and - Aerosol/Spray Pyrolysis. In general, a spool- to-spool or reel-to-reel type of continuous manufacturing scheme developed out of any of the above techniques, would consist of: - Preparation of Substrate Material - Preparation and Application of the Buffer Layer(s) - Preparation and Application of the HTS Material and Required Post-Annealing, and - Preparation and Application of the External Protective Layer. These operations would be affected by various process parameters which can be classified into: Chemistry and Material Related Parameters; and Engineering and Environmental Based Parameters. Thus, one can see that for successful development of the coated conductors manufacturing process, an

  2. Amorphous carbon buffer layers for separating free gallium nitride films

    NASA Astrophysics Data System (ADS)

    Altakhov, A. S.; Gorbunov, R. I.; Kasharina, L. A.; Latyshev, F. E.; Tarala, V. A.; Shreter, Yu. G.

    2016-11-01

    The possibility of using amorphous diamond-like carbon (DLC) films for self-separation of gallium nitride (GaN) layers grown by hydride vapor-phase epitaxy has been analyzed. DLC films have been synthesized by plasma-enhanced chemical vapor deposition under low pressure on sapphire (Al2O3) substrates with a (0001) crystallographic orientation. The samples have been studied by the methods of Raman scattering and X-ray diffraction analysis. It is shown that thin DLC films affect only slightly the processes of nucleation and growth of gallium nitride films. Notably, the strength of the "GaN film-Al2O3" substrate interface decreases, which facilitates separation of the GaN layers.

  3. Defect Reduction in Epitaxial Growth Using Superlattice Buffer Layers

    DTIC Science & Technology

    1988-07-01

    Katsuyama, Y. J. Yang and S. M. Bedair, Electron Dev. Lett., vol. 8, p. 240, 1987. 0 -15 -" Journal of (ryOstal (io iih 77 (108(,) ,xQ 9i4 S9 North-I...layer facilitat the csea of Gaosu 3 (5% in H2) + 500 sccm of H , and ed cross-sectional thickness measurements. trimethylgallium (TMG) + 500 sccm of H

  4. Hafnium nitride buffer layers for growth of GaN on silicon

    DOEpatents

    Armitage, Robert D.; Weber, Eicke R.

    2005-08-16

    Gallium nitride is grown by plasma-assisted molecular-beam epitaxy on (111) and (001) silicon substrates using hafnium nitride buffer layers. Wurtzite GaN epitaxial layers are obtained on both the (111) and (001) HfN/Si surfaces, with crack-free thickness up to 1.2 {character pullout}m. However, growth on the (001) surface results in nearly stress-free films, suggesting that much thicker crack-free layers could be obtained.

  5. Coercivity enhancement of Nd-Fe-B thin film magnets by Dy buffer and capping layers

    NASA Astrophysics Data System (ADS)

    You, C. Y.; Wang, J. W.; Lu, Z. X.

    2012-04-01

    The Dy layer was inserted into the structure of SiO2/Ti/Nd-Fe-B/Ti as the buffer or capping layer of the Nd-Fe-B layer. The insertions of Dy layers had no significant influence on the film texture with the easy axis mainly perpendicular to the film plane. The film without Dy layer gave the out-of-plane coercivity of 533 kA/m, maximum magnetic energy product (BH)max of 245 kJ/m3. With a Dy buffer layer, the out-of-plane coercivity and (BH)max were increased to 1074 kA/m, 291 kJ/m3 respectively. The film with Dy capping layer had a coercivity of 1035 kA/m and (BH)max of 286 kJ/m3. Microstructure observations showed that the Nd-rich phases were evolved into grain boundaries from triple junctions by a Dy buffer layer deposition, resulting in a well magnetic decoupling of Nd2Fe14B neighboring grains. Through capping a Dy layer, the environment of grain boundaries had been improved and some Dy diffused into Nd2Fe14B phases, which contributed to the enhancement of magnetic performance.

  6. Accelerating the L10 ordering transition of FePt(001) nanograins using composite buffer layers

    NASA Astrophysics Data System (ADS)

    Li, Guoqing; Zheng, Yuanping; Hayashi, Kenichi; Takanashi, Koki

    2011-07-01

    This paper reports fabrication of 2-nm-thick L10 FePt films at a low substrate temperature of 400 °C using composite MgO and FeAl buffer layers on (001) MgO substrates. The FeAl buffer layer is crucial in promoting the ordered L10 growth of (001) FePt by allowing additional heat uptake. The MgO buffer layer prevents interlayer diffusion of FeAl into the FePt films and induces (001) texture growth. The deposited FePt films consist of isolated nanograins about 13 nm in size. These films have (001) texture and perpendicular magnetic anisotropy with a coercivity of up to 19 kOe. They have potential applications in perpendicular magnetic recording.

  7. Growth and micro structural studies on Yittria Stabilized Zirconia (YSZ) and Strontium Titanate (STO) buffer layers

    NASA Technical Reports Server (NTRS)

    Srinivas, S.; Pinto, R.; Pai, S. P.; Dsousa, D. P.; Apte, P. R.; Kumar, D.; Purandare, S. C.; Bhatnagar, A. K.

    1995-01-01

    Microstructure of Yittria Stabilized Zirconia (YSZ) and Strontium Titanate (STO) of radio frequency magnetron sputtered buffer layers was studied at various sputtering conditions on Si (100), Sapphire and LaAlO3 (100) substrates. The effect of substrate temperatures up to 800 C and sputtering gas pressures in the range of 50 mTorr. of growth conditions was studied. The buffer layers of YSZ and STO showed a strong tendency for columnar growth was observed above 15 mTorr sputtering gas pressure and at high substrate temperatures. Post annealing of these films in oxygen atmosphere reduced the oxygen deficiency and strain generated during growth of the films. Strong c-axis oriented superconducting YBa2Cu3O7-x (YBCO) thin films were obtained on these buffer layers using pulsed laser ablation technique. YBCO films deposited on multilayers of YSZ and STO were shown to have better superconducting properties.

  8. Buffer layer between a planar optical concentrator and a solar cell

    SciTech Connect

    Solano, Manuel E.; Barber, Greg D.; Lakhtakia, Akhlesh; Faryad, Muhammad; Monk, Peter B.; Mallouk, Thomas E.

    2015-09-15

    The effect of inserting a buffer layer between a periodically multilayered isotropic dielectric (PMLID) material acting as a planar optical concentrator and a photovoltaic solar cell was theoretically investigated. The substitution of the photovoltaic material by a cheaper dielectric material in a large area of the structure could reduce the fabrication costs without significantly reducing the efficiency of the solar cell. Both crystalline silicon (c-Si) and gallium arsenide (GaAs) were considered as the photovoltaic material. We found that the buffer layer can act as an antireflection coating at the interface of the PMLID and the photovoltaic materials, and the structure increases the spectrally averaged electron-hole pair density by 36% for c-Si and 38% for GaAs compared to the structure without buffer layer. Numerical evidence indicates that the optimal structure is robust with respect to small changes in the grating profile.

  9. Effect of buffer layer and external stress on magnetic properties of flexible FeGa films

    NASA Astrophysics Data System (ADS)

    Zhang, Xiaoshan; Zhan, Qingfeng; Dai, Guohong; Liu, Yiwei; Zuo, Zhenghu; Yang, Huali; Chen, Bin; Li, Run-Wei

    2013-05-01

    We systematically investigated the effect of a Ta buffer layer and external stress on the magnetic properties of magnetostrictive Fe81Ga19 films deposited on flexible polyethylene terephthalate (PET) substrates. The Ta buffer layers could effectively smoothen the rough surface of PET. As a result, the FeGa films grown on Ta buffer layers exhibit a weaker uniaxial magnetic anisotropy and lower coercivity, as compared to those films directly grown on PET substrates. By inward and outward bending the FeGa/Ta/PET samples, external in-plane compressive and tensile stresses were applied to the magnetic films. Due to the inverse magnetostrictive effect of FeGa, both the coercivity and squareness of hysteresis loops for FeGa/Ta films could be well tuned under various strains.

  10. High-Performance Inverted Polymer Solar Cells with Zirconium Acetylacetonate Buffer Layers.

    PubMed

    Fan, Haijun; Zhu, Xiaozhang

    2016-12-14

    Inverted polymer solar cells incorporating solution-processed zirconium acetylacetonate (ZrAcac) buffer layers were demonstrated. The optimal device delivered a power conversion efficiency up to 9.2%, displaying ∼20% improvement compared with the device of conventional configuration. The performance improvement by adopting ZrAcac as the cathode buffer layer is attributed to the enhanced light-harvesting, facilitated electron transport, and reduced bimolecular recombination loss. The morphology of ZrAcac buffer layer was found to be critical in achieving high performance, which was tunable through the selection of processing solvents. A flat and uniform ZrAcac film consisting of ∼20 nm nanoscale aggregates deposited from a chloroform solution was proved to be highly effective, which only requires a short light-soaking time.

  11. The role of buffer layers and double windows layers in a solar cell CZTS performances

    NASA Astrophysics Data System (ADS)

    Mebarkia, C.; Dib, D.; Zerfaoui, H.; Belghit, R.

    2016-07-01

    In the overall context of the diversification of the use of natural resources, the use of renewable energy including solar photovoltaic has become increasingly indispensable. As such, the development of a new generation of photovoltaic cells based on CuZnSnS4 (CZTS) looks promising. Cu2ZnSnS4 (CZTS) is a new film absorber, with good physical properties (band gap energy 1.4-1.6 eV with a large absorption coefficient over 104 cm-1). Indeed, the performance of these cells exceeded 30% in recent years. In the present paper, our work based on modeling and numerical simulation, we used SCAPS to study the performance of solar cells based on Cu2ZnSnS4 (CZTS) and thus evaluate the electrical efficiency η for typical structures of n-ZnO:Al / i-ZnO / n-CdS / p-CZTS and n-ITO / n-ZnO:Al / n-CdS /p-CZTS. Furthermore, the influence of the change of CdS by ZnSeand In2S3buffer layer was treated in this paper.

  12. Indium Tin Oxide Electrode with an Ultrathin Al Buffer Layer for Flexible Organic Light Emitting Diode

    NASA Astrophysics Data System (ADS)

    Sim, Boyeon; Hwang, Hyeonseok; Ryu, Seungyoon; Baik, Hongkoo; Lee, Myeongkyu

    2010-06-01

    This paper reports that the mechanical and electrical stability of indium tin oxide (ITO) film deposited on flexible plastic substrate can be much enhanced with a thin Al buffer layer while maintaining a visible transmittance over 75%. The improved stability is attributed to the effective elastic mismatch between the film and the substrate reduced by a ductile interlayer. A polymer light emitting diode fabricated using an ITO/Al anode exhibited a luminance of 13,000 cd/m2 with a current efficiency of 16 cd/A. Bending-induced degradation of the device performance was also alleviated when a mechanical buffer layer was inserted.

  13. Electrical properties of GaAs metal–oxide–semiconductor structure comprising Al{sub 2}O{sub 3} gate oxide and AlN passivation layer fabricated in situ using a metal–organic vapor deposition/atomic layer deposition hybrid system

    SciTech Connect

    Aoki, Takeshi Fukuhara, Noboru; Osada, Takenori; Sazawa, Hiroyuki; Hata, Masahiko; Inoue, Takayuki

    2015-08-15

    This paper presents a compressive study on the fabrication and optimization of GaAs metal–oxide–semiconductor (MOS) structures comprising a Al{sub 2}O{sub 3} gate oxide, deposited via atomic layer deposition (ALD), with an AlN interfacial passivation layer prepared in situ via metal–organic chemical vapor deposition (MOCVD). The established protocol afforded self-limiting growth of Al{sub 2}O{sub 3} in the atmospheric MOCVD reactor. Consequently, this enabled successive growth of MOCVD-formed AlN and ALD-formed Al{sub 2}O{sub 3} layers on the GaAs substrate. The effects of AlN thickness, post-deposition anneal (PDA) conditions, and crystal orientation of the GaAs substrate on the electrical properties of the resulting MOS capacitors were investigated. Thin AlN passivation layers afforded incorporation of optimum amounts of nitrogen, leading to good capacitance–voltage (C–V) characteristics with reduced frequency dispersion. In contrast, excessively thick AlN passivation layers degraded the interface, thereby increasing the interfacial density of states (D{sub it}) near the midgap and reducing the conduction band offset. To further improve the interface with the thin AlN passivation layers, the PDA conditions were optimized. Using wet nitrogen at 600 °C was effective to reduce D{sub it} to below 2 × 10{sup 12} cm{sup −2} eV{sup −1}. Using a (111)A substrate was also effective in reducing the frequency dispersion of accumulation capacitance, thus suggesting the suppression of traps in GaAs located near the dielectric/GaAs interface. The current findings suggest that using an atmosphere ALD process with in situ AlN passivation using the current MOCVD system could be an efficient solution to improving GaAs MOS interfaces.

  14. CdS/CdTe thin-film solar cell with a zinc stannate buffer layer

    NASA Astrophysics Data System (ADS)

    Wu, X.; Sheldon, P.; Mahathongdy, Y.; Ribelin, R.; Mason, A.; Moutinho, H. R.; Coutts, T. J.

    1999-03-01

    This paper describes an improved CdS/CdTe polycrystalline thin-film solar-cell device structure that integrates a zinc stannate (Zn2SnO4 or ZTO) buffer layer between the transparent conductive oxide (TCO) layer and the CdS window layer. Zinc stannate films have a high bandgap, high transmittance, low absorptance, and low surface roughness. In addition, these films are chemically stable and exhibit higher resistivities that are roughly matched to that of the CdS window layer in the device structure. Preliminary device results have demonstrated that by integrating a ZTO buffer layer in both SnO2-based and Cd2SnO4 (CTO)-based CdS/CdTe devices, performance and reproducibility can be significantly enhanced.

  15. CdS/CdTe Thin-Film Solar Cell with a Zinc Stannate Buffer Layer

    SciTech Connect

    Wu, X.; Sheldon, P.; Mahathongdy, Y.; Ribelin, R.; Mason, A.; Moutinho, H. R.; Coutts, T. J.

    1998-10-28

    This paper describes an improved CdS/CdTe polycrystalline thin-film solar-cell device structure that integrates a zinc stannate (Zn2SnO4 or ZTO) buffer layer between the transparent conductive oxide (TCO) layer and the CdS window layer. Zinc stannate films have a high bandgap, high transmittance, low absorptance, and low surface roughness. In addition, these films are chemically stable and exhibit higher resistivities that are roughly matched to that of the CdS window layer in the device structure. Preliminary device results have demonstrated that by integrating a ZTO buffer layer in both SnO2-based and Cd2SnO4 (CTO)-based CdS/CdTe devices, performance and reproducibility can be significantly enhanced

  16. Strain compensation in a semiconducting device structure using an intentionally mismatched uniform buffer layer

    NASA Astrophysics Data System (ADS)

    Kujofsa, Tedi; Ayers, John E.

    2016-12-01

    The extent of strain relaxation in semiconducting device heterostructures has important implications in the design of high electron mobility transistors, light-emitting diodes, and laser diodes, in which the residual strain affects the device characteristics. In this work, we develop the theoretical framework for understanding strain compensation in a semiconductor device layer using a uniform buffer layer which can be intentionally mismatched to the material above. Specifically, we determined the critical condition for complete strain compensation in the device layer by intentionally introducing a compositional mismatch at the device-buffer interface. We present minimum energy calculations and show that for a given device layer with fixed mismatch and layer thickness, the buffer layer may be designed with the appropriate combination of thickness and mismatch such that the device layer will have zero residual strain in equilibrium. Such a structure can be referred to as a completely strain-compensated design. In the more general case, there may be partial strain compensation, and we give a simple physics-based Gaussian-type function describing the residual strain in the device layer. We have applied this general framework to In x Ga1-x As/GaAs (001) heterostructures for the purpose of illustration, but the work is applicable to any diamond or zinc blende (001) heteroepitaxial material system.

  17. Exciton-blocking phosphonic acid-treated anode buffer layers for organic photovoltaics

    NASA Astrophysics Data System (ADS)

    Zimmerman, Jeramy D.; Song, Byeongseop; Griffith, Olga; Forrest, Stephen R.

    2013-12-01

    We demonstrate significant improvements in power conversion efficiency of bilayer organic photovoltaics by replacing the exciton-quenching MoO3 anode buffer layer with an exciton-blocking benzylphosphonic acid (BPA)-treated MoO3 or NiO layer. We show that the phosphonic acid treatment creates buffers that block up to 70% of excitons without sacrificing the hole extraction efficiency. Compared to untreated MoO3 anode buffers, BPA-treated NiO buffers exhibit a ˜ 25% increase in the near-infrared spectral response in diphenylanilo functionalized squaraine (DPSQ)/C60-based bilayer devices, increasing the power conversion efficiency under 1 sun AM1.5G simulated solar illumination from 4.8 ± 0.2% to 5.4 ± 0.3%. The efficiency can be further increased to 5.9 ± 0.3% by incorporating a highly conductive exciton blocking bathophenanthroline (BPhen):C60 cathode buffer. We find similar increases in efficiency in two other small-molecule photovoltaic systems, indicating the generality of the phosphonic acid-treated buffer approach to enhance exciton blocking.

  18. Alternative buffer layer development in Cu(In,Ga)Se2 thin film solar cells

    NASA Astrophysics Data System (ADS)

    Xin, Peipei

    Cu(In,Ga)Se2-based thin film solar cells are considered to be one of the most promising photovoltaic technologies. Cu(In,Ga)Se2 (CIGS) solar devices have the potential advantage of low-cost, fast fabrication by using semiconductor layers of only a few micrometers thick and high efficiency photovoltaics have been reported at both the cell and the module levels. CdS via chemical bath deposition (CBD) has been the most widely used buffer option to form the critical junction in CIGS-based thin film photovoltaic devices. However, the disadvantages of CdS can’t be ignored - regulations on cadmium usage are getting stricter primarily due to its toxicity and environmental impacts, and the proper handling of the large amount of toxic chemical bath waste is a massive and expensive task. This dissertation is devoted to the development of Cd-free alternative buffer layers in CIGS-based thin film solar cells. Based on the considerations of buffer layer selection criteria and extensive literature review, Zn-compound buffer materials are chosen as the primary investigation candidates. Radio frequency magnetron sputtering is the preferred buffer deposition approach since it’s a clean and more controllable technique compared to CBD, and is readily scaled to large area manufacturing. First, a comprehensive study of the ZnSe1-xOx compound prepared by reactive sputtering was completed. As the oxygen content in the reactive sputtering gas increased, ZnSe1-xOx crystallinity and bandgap decreased. It’s observed that oxygen miscibility in ZnSe was low and a secondary phase formed when the O2 / (O2 + Ar) ratio in the sputtering gas exceeded 2%. Two approaches were proposed to optimize the band alignment between the CIGS and buffer layer. One method focused on the bandgap engineering of the absorber, the other focused on the band structure modification of the buffer. As a result, improved current of the solar cell was achieved although a carrier transport barrier at the junction

  19. Growth of thicker zinc-blende CrSb layers by using (In,Ga)As buffer layers

    NASA Astrophysics Data System (ADS)

    Deng, J. J.; Zhao, J. H.; Bi, J. F.; Niu, Z. C.; Yang, F. H.; Wu, X. G.; Zheng, H. Z.

    2006-05-01

    Zinc-blende CrSb (zb-CrSb) layers with room-temperature ferromagnetism have been grown on (In,Ga)As buffer layers epitaxially prepared on (001) GaAs substrates by molecular-beam epitaxy. Compared with the typical thickness [2-3 ML (ML denotes monolayers)] of zb-CrSb grown directly on GaAs, the thickness of zb-CrSb grown on (In,Ga)As has been increased largely; the maximum can be up to ~9 ML. High-resolution cross sectional transmission electron microscopy images show that the zb-CrSb layer is combined with (In,Ga)As buffer layer without any dislocations at the interface.

  20. Growth of thicker zinc-blende CrSb layers by using (In,Ga)As buffer layers

    SciTech Connect

    Deng, J.J.; Zhao, J.H.; Bi, J.F.; Niu, Z.C.; Yang, F.H.; Wu, X.G.; Zheng, H.Z.

    2006-05-01

    Zinc-blende CrSb (zb-CrSb) layers with room-temperature ferromagnetism have been grown on (In,Ga)As buffer layers epitaxially prepared on (001) GaAs substrates by molecular-beam epitaxy. Compared with the typical thickness [2-3 ML (ML denotes monolayers)] of zb-CrSb grown directly on GaAs, the thickness of zb-CrSb grown on (In,Ga)As has been increased largely; the maximum can be up to {approx}9 ML. High-resolution cross sectional transmission electron microscopy images show that the zb-CrSb layer is combined with (In,Ga)As buffer layer without any dislocations at the interface.

  1. Ab initio modeling of zincblende AlN layer in Al-AlN-TiN multilayers

    SciTech Connect

    Yadav, S. K.; Wang, J.; Liu, X. -Y.

    2016-06-13

    An unusual growth mechanism of metastable zincblende AlN thin film by diffusion of nitrogen atoms into Al lattice is established. Using first-principles density functional theory, we studied the possibility of thermodynamic stability of AlN as a zincblende phase due to epitaxial strains and interface effect, which fails to explain the formation of zincblende AlN. We then compared the formation energetics of rocksalt and zincblende AlN in fcc Al through direct diffusion of nitrogen atoms to Al octahedral and tetrahedral interstitials. Furthermore, the formation of a zincblende AlN thin film is determined to be a kinetically driven process, not a thermodynamically driven process.

  2. Ab initio modeling of zincblende AlN layer in Al-AlN-TiN multilayers

    SciTech Connect

    Yadav, S. K.; Wang, J.; Liu, X. -Y.

    2016-06-13

    An unusual growth mechanism of metastable zincblende AlN thin film by diffusion of nitrogen atoms into Al lattice is established. Using first-principles density functional theory, we studied the possibility of thermodynamic stability of AlN as a zincblende phase due to epitaxial strains and interface effect, which fails to explain the formation of zincblende AlN. We then compared the formation energetics of rocksalt and zincblende AlN in fcc Al through direct diffusion of nitrogen atoms to Al octahedral and tetrahedral interstitials. Furthermore, the formation of a zincblende AlN thin film is determined to be a kinetically driven process, not a thermodynamically driven process.

  3. Effect of buffer layer on the voltage responsivity of the pyroelectric thermal sensors prepared with PZT ceramics

    NASA Astrophysics Data System (ADS)

    Lee, Moon-Ho; Hwang, Ha R.; Bae, Seong-Ho

    1997-08-01

    The pyroelectric thermal detectors were prepared with lead zirconate titanate (PZT) ceramics, where a signal electrode had a structure of Au/metallic buffer/(PZT ceramic). The effect of buffer layer on the voltage responsivity was investigated with a response to step signal, taken by dynamic pyroelectric measurement. Pyroelectric ceramic wafer was prepared by mixed oxide technique. Au layer (thickness: 50 nm) and metallic buffers (thickness: 0 - 20 nm) of Cr, NiCr (80/20), and Ti were prepared by dc magnetron sputtering. In order to improve the light absorptivity, an Au-black was coated on Au signal electrode by thermal evaporation. At steady state, the output voltage (Vo) was decreased with increasing chopping frequency in the range of 1 - 100 Hz. A sensor without buffer showed the severe time-drift and instability in the output signal. However, the sensors with buffer layer showed the stable outputs. For step radiations, rising time (tp), peak voltage (Vp), and initial slope (k) of the output voltage were dependent upon the thickness and materials of buffer layer. The mechanical and electrical contacts between Au electrode and PZT ceramics were improved by inserting the metallic buffer layer. Considering the characteristics of the output voltage, the optimum thickness of buffer layer was about 15 - 20 nm, and the sensors with Ti buffer of 15 - 20 nm in thickness showed the good detectivity. Therefore, the stability and reliability of the thermal sensors could be improved by use of appropriate buffer layer.

  4. Methods of producing free-standing semiconductors using sacrificial buffer layers and recyclable substrates

    DOEpatents

    Ptak, Aaron Joseph; Lin, Yong; Norman, Andrew; Alberi, Kirstin

    2015-05-26

    A method of producing semiconductor materials and devices that incorporate the semiconductor materials are provided. In particular, a method is provided of producing a semiconductor material, such as a III-V semiconductor, on a spinel substrate using a sacrificial buffer layer, and devices such as photovoltaic cells that incorporate the semiconductor materials. The sacrificial buffer material and semiconductor materials may be deposited using lattice-matching epitaxy or coincident site lattice-matching epitaxy, resulting in a close degree of lattice matching between the substrate material and deposited material for a wide variety of material compositions. The sacrificial buffer layer may be dissolved using an epitaxial liftoff technique in order to separate the semiconductor device from the spinel substrate, and the spinel substrate may be reused in the subsequent fabrication of other semiconductor devices. The low-defect density semiconductor materials produced using this method result in the enhanced performance of the semiconductor devices that incorporate the semiconductor materials.

  5. Benzocyclobutene (BCB) Polymer as Amphibious Buffer Layer for Graphene Field-Effect Transistor.

    PubMed

    Wu, Yun; Zou, Jianjun; Huo, Shuai; Lu, Haiyan; Kong, Yuecan; Chen, Tangshen; Wu, Wei; Xu, Jingxia

    2015-08-01

    Owing to the scattering and trapping effects, the interfaces of dielectric/graphene or substrate/graphene can tailor the performance of field-effect transistor (FET). In this letter, the polymer of benzocyclobutene (BCB) was used as an amphibious buffer layer and located at between the layers of substrate and graphene and between the layers of dielectric and graphene. Interestingly, with the help of nonpolar and hydrophobic BCB buffer layer, the large-scale top-gated, chemical vapor deposited (CVD) graphene transistors was prepared on Si/SiO2 substrate, its cutoff frequency (fT) and the maximum cutoff frequency (fmax) of the graphene field-effect transistor (GFET) can be reached at 12 GHz and 11 GHz, respectively.

  6. Growth and micro structural studies on Yittria Stabilized Zirconia (YSZ) and Strontium Titanate (STO) buffer layers

    SciTech Connect

    Srinivas, S.; Bhatnagar, A.K.; Pinto, R.

    1994-12-31

    Microstructure of Yittria Stabilized Zirconia (YSZ) and Strontium Titanate (STO) of radio frequency magnetron sputtered buffer layers was studied at various sputtering conditions on Si<100>, Sapphire and LaAlO{sub 3} <100> substrates. The effect of substrate temperatures upto 800 C and sputtering gas pressures in the range of 50 mTorr. of growth conditions was studied. The buffer layers of YSZ and STO showed a strong tendency for columnar structure with variation growth conditions. The buffer layers of YSZ and STO showed orientation. The tendency for columnar growth was observed above 15 mTorr sputtering gas pressure and at high substrate temperatures. Post annealing of these films in oxygen atmosphere reduced the oxygen deficiency and strain generated during growth of the films. Strong c-axis oriented superconducting YBa{sub 2}Cu{sub 9}O{sub 7-x} (YBCO) thin films were obtained on these buffer layers using pulsed laser ablation technique. YBCO films deposited on multilayers of YSZ and STO were shown to have better superconducting properties.

  7. Sol-gel deposition of buffer layers on biaxially textured metal substances

    SciTech Connect

    Shoup, S.S.; Paranthamam, M.; Beach, D.B.; Kroeger, D.M.; Goyal, A.

    2000-06-20

    A method is disclosed for forming a biaxially textured buffer layer on a biaxially oriented metal substrate by using a sol-gel coating technique followed by pyrolyzing/annealing in a reducing atmosphere. This method is advantageous for providing substrates for depositing electronically active materials thereon.

  8. Sol-gel deposition of buffer layers on biaxially textured metal substances

    DOEpatents

    Shoup, Shara S.; Paranthamam, Mariappan; Beach, David B.; Kroeger, Donald M.; Goyal, Amit

    2000-01-01

    A method is disclosed for forming a biaxially textured buffer layer on a biaxially oriented metal substrate by using a sol-gel coating technique followed by pyrolyzing/annealing in a reducing atmosphere. This method is advantageous for providing substrates for depositing electronically active materials thereon.

  9. Influence of C or In buffer layer on photoluminescence behaviour of ultrathin ZnO film

    SciTech Connect

    Saravanan, K. Jayalakshmi, G.; Krishnan, R.; Sundaravel, B.; Panigrahi, B. K.

    2016-09-07

    We study the effect of the indium or carbon buffer layer on the photoluminescence (PL) property of ZnO ultrathin films deposited on a Si(100) substrate. The surface morphology of the films obtained using scanning tunnelling microscopy shows spherical shaped ZnO nanoparticles of size ∼8 nm in ZnO/C/Si and ∼22 nm in ZnO/Si samples, while the ZnO/In/Si sample shows elliptical shaped ZnO particles. Further, the ZnO/C/Si sample shows densely packed ZnO nanoparticles in comparison with other samples. Strong band edge emission has been observed in the presence of In or C buffer layer, whereas the ZnO/Si sample exhibits poor PL emission. The influence of C and In buffer layers on the PL behaviour of ZnO films is studied in detail using temperature dependent PL measurements in the range of 4 K–300 K. The ZnO/C/Si sample exhibits a multi-fold enhancement in the PL emission intensity with well-resolved free and bound exciton emission lines. Our experimental results imply that the ZnO films deposited on the C buffer layer showed higher particle density and better exciton emission desired for optoelectronic applications.

  10. Effect of buffer layer on thermochromic performances of VO2 films fabricated by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Zhu, Benqin; Tao, Haizheng; Zhao, Xiujian

    2016-03-01

    As a well-developed industrial fabricating method, magnetron sputtering technique has its distinct advantages for the large-scale production. In order to investigate the effect of buffer layer on the formation and thermochromic performances of VO2 films, using RF magnetron sputtering method, we fabricated three kinds of buffer layers SiO2, TiO2 and SnO2 on soda lime float-glass. Then according to the reactive DC magnetron sputtering method, VO2 films were deposited. Due to the restriction of heat treatment temperature when using soda lime float-glass as substrates, dense rutile phase TiO2 cannot be formed, leading to the formation of vanadium oxide compounds containing Na ions. When using SnO2 as buffer layer, we found that relatively high pure VO2 can be deposited more easily. In addition, compared with the effect of SiO2 buffer layer, we observed an enhanced visible transparency, a decreased infrared emissivity, which should be mainly originated from the modified morphology and/or the hetero-structured VO2/SnO2 interface.

  11. Digitally Alloyed Modulated Precursor Flow Epitaxial Growth of Ternary AlGaN with Binary AlN and GaN Sub-Layers and Observation of Compositional Inhomogeneity

    NASA Astrophysics Data System (ADS)

    Kim, Hee Jin; Choi, Suk; Yoo, Dongwon; Ryou, Jae-Hyun; Hawkridge, Michael E.; Liliental-Weber, Zuzanna; Dupuis, Russell D.

    2010-05-01

    We report the growth of ternary aluminum gallium nitride (AlGaN) layers on AlN/sapphire template/substrates by digitally alloyed modulated precursor flow epitaxial growth (DA-MPEG), which combined an MPEG AlN sub-layer with a conventional metalorganic chemical vapor deposition (MOCVD)-grown GaN sub-layer. The overall composition in DA-MPEG Al x Ga1- x N was controlled by adjustment of the growth time (i.e., the thickness) of the GaN sub-layer. As the GaN sub-layer growth time increased, the Al composition in AlGaN decreased to 50%, but the surface morphology of the AlGaN layer became rough, and a three-dimensional structure with islands appeared for the DA-MPEG AlGaN with relatively thick GaN sub-layers, possibly resulting from the Ga adatom surface migration behavior and/or the strain built up from lattice mismatch between AlN and GaN sub-layers with increasing GaN sub-layer growth time. Through strain analysis by high-resolution x-ray diffraction, reciprocal space mapping, and scanning transmission electron microscopy, it was found that there was compositional inhomogeneity in the DA-MPEG AlGaN with AlN and GaN binary sub-layers for the case of the layer with relatively thick GaN sub-layers.

  12. Compatibility of the selective area growth of GaN nanowires on AlN-buffered Si substrates with the operation of light emitting diodes.

    PubMed

    Musolino, M; Tahraoui, A; Fernández-Garrido, S; Brandt, O; Trampert, A; Geelhaar, L; Riechert, H

    2015-02-27

    AlN layers with thicknesses between 2 and 14 nm were grown on Si(111) substrates by molecular beam epitaxy. The effect of the AlN layer thickness on the morphology and nucleation time of spontaneously formed GaN nanowires (NWs) was investigated by scanning electron microscopy and line-of-sight quadrupole mass spectrometry, respectively. We observed that the alignment of the NWs grown on these layers improves with increasing layer thickness while their nucleation time decreases. Our results show that 4 nm is the smallest thickness of the AlN layer that allows the growth of well-aligned NWs with short nucleation time. Such an AlN buffer layer was successfully employed, together with a patterned SiOx mask, for the selective-area growth (SAG) of vertical GaN NWs. In addition, we fabricated light-emitting diodes (LEDs) from NW ensembles that were grown by means of self-organization phenomena on bare and on AlN-buffered Si substrates. A careful characterization of the optoelectronic properties of the two devices showed that the performance of NW-LEDs on bare and AlN-buffered Si is similar. Electrical conduction across the AlN buffer is facilitated by a high number of grain boundaries that were revealed by transmission electron microscopy. These results demonstrate that grainy AlN buffer layers on Si are compatible both with the SAG of GaN NWs and LED operation. Therefore, this study is a first step towards the fabrication of LEDs on Si substrates based on homogeneous NW ensembles.

  13. Characterization of Cu buffer layers for growth of L1{sub 0}-FeNi thin films

    SciTech Connect

    Mizuguchi, M.; Sekiya, S.; Takanashi, K.

    2010-05-15

    A Cu(001) layer was fabricated on a Au(001) layer to investigate the use of Cu as a buffer layer for growing L1{sub 0}-FeNi thin films. The epitaxial growth of a Cu buffer layer was observed using reflection high-energy electron diffraction. The flatness of the layer improved drastically with an increase in the substrate temperature although the layer was an alloy (AuCu{sub 3}). An FeNi thin film was epitaxially grown on the AuCu{sub 3} buffer layer by alternate monatomic layer deposition and the formation of an L1{sub 0}-FeNi ordered alloy was expected. The AuCu{sub 3} buffer layer is thus a promising candidate material for the growth of L1{sub 0}-FeNi thin films.

  14. Final Report: Rational Design of Wide Band Gap Buffer Layers for High-Efficiency Thin-Film Photovoltaics

    SciTech Connect

    Lordi, Vincenzo

    2016-09-30

    The main objective of this project is to enable rational design of wide band gap buffer layer materials for CIGS thin-film PV by building understanding of the correlation of atomic-scale defects in the buffer layer and at the buffer/absorber interface with device electrical properties. Optimized wide band gap buffers are needed to reduce efficiency loss from parasitic absorption in the buffer. The approach uses first-principles materials simulations coupled with nanoscale analytical electron microscopy as well as device electrical characterization. Materials and devices are produced by an industrial partner in a manufacturing line to maximize relevance, with the goal of enabling R&D of new buffer layer compositions or deposition processes to push device efficiencies above 21%. Cadmium sulfide (CdS) is the reference material for analysis, as the prototypical high-performing buffer material.

  15. Exploring Cd-Zn-O-S alloys for improved buffer layers in thin-film photovoltaics

    NASA Astrophysics Data System (ADS)

    Varley, J. B.; Lordi, V.; He, X.; Rockett, A.

    2017-07-01

    To compete with existing and more mature solar cell technologies such as crystalline Si, thin-film photovoltaics require optimization of every aspect in the device heterostructure to reach maximum efficiencies and cost effectiveness. For absorbers like CdTe, Cu(In ,Ga )Se 2 (CIGSe), and Cu2ZnSn(S ,Se ) 4 (CZTSSe), improving the n -type buffer layer partner beyond conventional CdS is one avenue that can reduce photocurrent losses and improve overall performance. Here, we use first-principles calculations based on hybrid functionals to explore alloys spanning the Cd-, Zn-, O-, and S-containing phase space to identify compositions that may be superior to common buffers like pure CdS or Zn(O,S). We address issues highly correlated with device performance such as lattice-matching for improved buffer-absorber epitaxy and interface quality, dopability, the band gap for reduced absorption losses in the buffer, and the conduction-band offsets shown to facilitate improved charge separation from photoexcited carriers. We supplement our analysis with device-level simulations as parameterized from our calculations and real devices to assess our conclusions of low-Zn and O content buffers showing improved performance with respect to CdS buffers.

  16. Layer-based buffer aware rate adaptation design for SHVC video streaming

    NASA Astrophysics Data System (ADS)

    Gudumasu, Srinivas; Hamza, Ahmed; Asbun, Eduardo; He, Yong; Ye, Yan

    2016-09-01

    This paper proposes a layer based buffer aware rate adaptation design which is able to avoid abrupt video quality fluctuation, reduce re-buffering latency and improve bandwidth utilization when compared to a conventional simulcast based adaptive streaming system. The proposed adaptation design schedules DASH segment requests based on the estimated bandwidth, dependencies among video layers and layer buffer fullness. Scalable HEVC video coding is the latest state-of-art video coding technique that can alleviate various issues caused by simulcast based adaptive video streaming. With scalable coded video streams, the video is encoded once into a number of layers representing different qualities and/or resolutions: a base layer (BL) and one or more enhancement layers (EL), each incrementally enhancing the quality of the lower layers. Such layer based coding structure allows fine granularity rate adaptation for the video streaming applications. Two video streaming use cases are presented in this paper. The first use case is to stream HD SHVC video over a wireless network where available bandwidth varies, and the performance comparison between proposed layer-based streaming approach and conventional simulcast streaming approach is provided. The second use case is to stream 4K/UHD SHVC video over a hybrid access network that consists of a 5G millimeter wave high-speed wireless link and a conventional wired or WiFi network. The simulation results verify that the proposed layer based rate adaptation approach is able to utilize the bandwidth more efficiently. As a result, a more consistent viewing experience with higher quality video content and minimal video quality fluctuations can be presented to the user.

  17. From front contact to back contact in cadmium telluride/cadmium sulfide solar cells: Buffer layer and interfacial layer

    NASA Astrophysics Data System (ADS)

    Roussillon, Yann

    Cadmium telluride (CdTe) polycrystalline thin film solar cells, with their near optimum direct band-gap of 1.4 eV matching almost perfectly the sun radiation spectrum, are a strong contender as a less expensive alternative, among photovoltaic materials, than the more commonly used silicon-based cells. Polycrystalline solar cells are usually deposited over large areas. Such devices often exhibit strong fluctuations (nonuniformities) in electronic properties, which originate from deposition and post-deposition processes, and are detrimental to the device performance. Therefore their effects need to be constrained. A new approach in this work was, when a CdS/CdTe solar cell is exposed to light and immersed in a proper electrolyte, fluctuations in surface potential can drive electrochemical reactions which result in a nonuniform interfacial layer that could balance the original nonuniformity. This approach improved the device efficiency for CdS/CdTe photovoltaic devices from 1--3% to 11--12%. Cadmium sulfide (CdS), used as a window layer and heterojunction partner to CdTe, is electrically inactive and absorb light energies above its band-gap of 2.4 eV. Therefore, to maximize the device efficiency, a thin US layer needs to be used. However, more defects, such as pinholes, are likely to be present in the film, leading to shunts. A resistive transparent layer, called buffer layer, is therefore deposited before CdS. A key observation was that the open-circuit voltage (Voc) for cells made using a buffer layer was high, around 800 mV, similar to cells without buffer layer after Cu doping. The standard p-n junction theory cannot explain this phenomena, therefore an alternative junction mechanism, similar to metal-insulator-semiconductor devices, was developed. Furthermore, alternative Cu-free back-contacts were used in conjunction with a buffer layer. The Voc of the devices was found to be dependent of the back contact used. This change occurs as the back-contact junction

  18. Improvement of luminescence properties of GaN buffer layer for fast nitride scintillator structures

    NASA Astrophysics Data System (ADS)

    Hubáček, T.; Hospodková, A.; Oswald, J.; Kuldová, K.; Pangrác, J.

    2017-04-01

    We have optimized technology of GaN buffer layer growth with respect to the application in fast scintillation structures. The deep defect luminescence so called yellow band (YB) with decay time up to tens of microseconds is undesired for these applications and should be suppressed or at least the ratio of intensities of excitonic to YB maximum has to be considerably increased. The required photoluminescence properties were achieved by optimization of growth parameters of nucleation and coalescence layer on sapphire substrate. We have shown that decrease of NH3 flow, decrease of coalescence temperature, increase of nucleation time and nucleation pressure lead to improvement of the structure and luminescence properties of the buffer layer. Results indicate a significant increased ratio of excitonic/YB luminescence intensity.

  19. Modeling and performance analysis dataset of a CIGS solar cell with ZnS buffer layer.

    PubMed

    Hosen, Md Billal; Bahar, Ali Newaz; Ali, Md Karamot; Asaduzzaman, Md

    2017-10-01

    This article represents the baseline data of the several semiconductor materials used in the model of a CIGS thin film solar cell with an inclusion of ZnS buffer layer. As well, input parameters, contact layer data and operating conditions for CIGS solar cell simulation with ZnS buffer layer have been described. The schematic diagram of photovoltaic solar cell has been depicted. Moreover, the most important performance measurement graph, J-V characteristic curve, resulting from CIGS solar cell simulation has been analyzed to estimate the optimum values of fill factor and cell efficiency. These optimum results have been obtained from the open circuit voltage, short circuit current density, and the maximum points of voltage and current density generated from the cell.

  20. Epitaxial growth of cadmium telluride films on silicon with a buffer silicon carbide layer

    NASA Astrophysics Data System (ADS)

    Antipov, V. V.; Kukushkin, S. A.; Osipov, A. V.

    2017-02-01

    An epitaxial 1-3-μm-thick cadmium telluride film has been grown on silicon with a buffer silicon carbide layer using the method of open thermal evaporation and condensation in vacuum for the first time. The optimum substrate temperature was 500°C at an evaporator temperature of 580°C, and the growth time was 4 s. In order to provide more qualitative growth of cadmium telluride, a high-quality 100-nm-thick buffer silicon carbide layer was previously synthesized on the silicon surface using the method of topochemical substitution of atoms. The ellipsometric, Raman, X-ray diffraction, and electron-diffraction analyses showed a high structural perfection of the CdTe layer in the absence of a polycrystalline phase.

  1. Epitaxial MOD-YSZ buffer layers on IBAD-YSZ substrates

    NASA Astrophysics Data System (ADS)

    Jarzina, H.; Sievers, S.; Jooss, Ch; Freyhardt, H. C.; Lobinger, P.; Roesky, H. W.

    2005-03-01

    There are a number of reports on the epitaxial growth of MOD buffer layers for coated conductors. However, the quality of superconducting films deposited on top of these layers is often poor. We demonstrate that Y Ba2Cu3O7 (YBCO) layers with a high critical current density of 20 MA cm-2 (8 K) can be deposited on MOD-YSZ (ZrO2:10 mol% Y2O3) which has been grown epitaxially on YSZ(001) single crystals. Furthermore, high jc YBCO films are obtained on a MOD-YSZ buffer deposited on an IBAD (ion-beam-assisted-deposition)-YSZ substrate. In this case, critical current densities of 11 MA cm-2 (8 K) are observed. Finally, multilayers of MOD-YSZ on IBAD-YSZ substrates are prepared, where the development of texture with increasing film thickness is discussed as well as its possible technological impact.

  2. Development of buffer layers on 30 mm wide textured metal substrates for REBCO coated conductors

    NASA Astrophysics Data System (ADS)

    Yamaguchi, T.; Ota, H.; Ohki, K.; Konishi, M.; Ohmatsu, K.

    2010-11-01

    We have been studying REBa2Cu3Ox (RE: rare earth elements) coated conductors on clad-type substrates. We developed coated conductors on the 10 mm wide clad-type tape, and succeeded in obtaining the maximum critical current of 380 A/cm with the 2.0 μm thick GdBa2Cu3Ox superconducting film. At present, we are trying to widen the tape width from 10 mm to 30 mm in order to increase production throughput. We report our recent progress on scaling-up of the buffer layers and their properties. The buffer layers consisted of three layers; CeO2 as the seed layer, yttrium-stabilized zirconia (YSZ) as the diffusion barrier layer and CeO2 as the lattice matching layer. They were grown by the RF-sputtering method and the electron beam evaporation technique (EB). EB deposition has possibility of higher throughput compared with the RF-sputtering. The intensity ratio of (2 0 0) to (2 0 0) + (1 1 1) for the lattice matching layer showed as high as 98%. The uniform properties of 40 m long and 30 mm wide substrates were successfully produced by all sputtering method. Additionally, the tape travel speed of the seed layer can be increased from 7 m/h (RF-sputtering deposition) to 10 m/h (EB deposition) on short sample (0.3 m long).

  3. Conduction band offset engineering in wide-bandgap Ag(In,Ga)Se2 solar cells by hybrid buffer layer

    NASA Astrophysics Data System (ADS)

    Umehara, Takeshi; Zulkifly, Faris Akira Bin Mohd; Nakada, Kazuyoshi; Yamada, Akira

    2017-08-01

    Ag(In,Ga)Se2 (AIGS) is one of the promising candidates for the top cell absorber in the tandem structure. However, the conversion efficiency of AIGS solar cells is still lower than that required for the top cell. In this study, to improve the conversion efficiency of AIGS solar cells, we controlled the conduction band offset (CBO) at the buffer layer/ZnO and buffer layer/AIGS interfaces. The reduction in interface recombination at the CdS buffer layer/AIGS interface was achieved by introducing a ZnS(O,OH) buffer layer instead of a CdS buffer layer, although the fill factor (FF) decreased markedly because the CBO at the ZnS(O,OH)/ZnO interface prevented the electron flow under a forward bias. We found that the introduction of a CdS/ZnS(O,OH) hybrid buffer layer is efficient in controlling the CBO at both the buffer layer/AIGS and buffer layer/ZnO interfaces and improving the solar cell conversion efficiency.

  4. Effect of Cu buffer layer on magnetic anisotropy of cobalt thin films deposited on MgO(001) substrate

    NASA Astrophysics Data System (ADS)

    Ahmad, Syed Sheraz; He, Wei; Zhang, Yong-Sheng; Tang, Jin; Gul, Qeemat; Zhang, Xiang-Qun; Cheng, Zhao-Hua

    2016-11-01

    Cobalt thin films with 5 nm thickness were prepared on single-crystal MgO (001) substrates with different thickness Cu buffer (0 nm, 5 nm, 10 nm, 20 nm). The structure, magnetic properties and transport behaviors were investigated by employing low-energy-electron-diffraction (LEED), magneto-optical Kerr effect (MOKE) and anisotropic magnetoresistance (AMR). By comparing the magnetic properties of the sample as-deposited (without Cu buffer layer) one with those having the buffer Cu, we found that the magnetic anisotropy was extremely affected by the Cu buffer layer. The magnetic anisotropy of the as-deposited, without buffer layer, sample shows the uniaxial magnetic anisotropy (UMA). We found that the symmetry of the magnetic anisotropy is changed from UMA to four-fold when the thickness of the Cu buffer layer reaches to 20 nm. Meanwhile, the coercivity increased from 49 Oe (without buffer layer) to 300 Oe (with 20 nm Cu buffer), in the easy axis direction, as the thickness of the buffer layer increases. Moreover, the magnitudes of various magnetic anisotropy constants were determined from torque curves on the basis of AMR results. These results support the phenomenon shown in the MOKE.

  5. Pyroelectric and dielectric properties of ferroelectric films with interposed dielectric buffer layers

    NASA Astrophysics Data System (ADS)

    Espinal, Y.; Kesim, M. T.; Misirlioglu, I. B.; Trolier-McKinstry, S.; Mantese, J. V.; Alpay, S. P.

    2014-12-01

    The dielectric and pyroelectric properties of c-domain ferroelectric films with linear dielectric buffer layers were investigated theoretically. Computations were carried out for multilayers consisting of PbZr0.2Ti0.8O3 with Al2O3, SiO2, Si3N4, HfO2, and TiO2 buffers on metalized Si. It is shown that the dielectric and pyroelectric properties of such multilayers can be increased by the presence of the buffer compared to ferroelectric monolayers. Calculations for PbZr0.2Ti0.8O3 films with 1% Al2O3 interposed between electrodes on Si show that the dielectric and pyroelectric coefficients are 310 and 0.070 μC cm-2 °C-1, respectively. Both values are higher than the intrinsic response of PbZr0.2Ti0.8O3 monolayer on Si.

  6. Coincident site lattice-matched growth of semiconductors on substrates using compliant buffer layers

    DOEpatents

    Norman, Andrew

    2016-08-23

    A method of producing semiconductor materials and devices that incorporate the semiconductor materials are provided. In particular, a method is provided of producing a semiconductor material, such as a III-V semiconductor, on a silicon substrate using a compliant buffer layer, and devices such as photovoltaic cells that incorporate the semiconductor materials. The compliant buffer material and semiconductor materials may be deposited using coincident site lattice-matching epitaxy, resulting in a close degree of lattice matching between the substrate material and deposited material for a wide variety of material compositions. The coincident site lattice matching epitaxial process, as well as the use of a ductile buffer material, reduce the internal stresses and associated crystal defects within the deposited semiconductor materials fabricated using the disclosed method. As a result, the semiconductor devices provided herein possess enhanced performance characteristics due to a relatively low density of crystal defects.

  7. Solution-processed In2S3 buffer layer for chalcopyrite thin film solar cells

    NASA Astrophysics Data System (ADS)

    Wang, Lan; Lin, Xianzhong; Ennaoui, Ahmed; Wolf, Christian; Lux-Steiner, Martha Ch.; Klenk, Reiner

    2016-02-01

    We report a route to deposit In2S3 thin films from air-stable, low-cost molecular precursor inks for Cd-free buffer layers in chalcopyrite-based thin film solar cells. Different precursor compositions and processing conditions were studied to define a reproducible and robust process. By adjusting the ink properties, this method can be applied in different printing and coating techniques. Here we report on two techniques, namely spin-coating and inkjet printing. Active area efficiencies of 12.8% and 12.2% have been achieved for In2S3-buffered solar cells respectively, matching the performance of CdS-buffered cells prepared with the same batch of absorbers.

  8. Electron dynamics of the buffer layer and bilayer graphene on SiC

    SciTech Connect

    Shearer, Alex J.; Caplins, Benjamin W.; Suich, David E.; Harris, Charles B.; Johns, James E.; Hersam, Mark C.

    2014-06-09

    Angle- and time-resolved two-photon photoemission (TPPE) was used to investigate electronic states in the buffer layer of 4H-SiC(0001). An image potential state (IPS) series was observed on this strongly surface-bound buffer layer, and dispersion measurements indicated free-electron-like behavior for all states in this series. These results were compared with TPPE taken on bilayer graphene, which also show the existence of a free-electron-like IPS series. Lifetimes for the n = 2, and n = 3 states were obtained from time-resolved TPPE; slightly increased lifetimes were observed in the bilayer graphene sample for the n = 2 the n = 3 states. Despite the large band gap of graphene at the center of the Brillouin zone, the lifetime results demonstrate that the graphene layers do not behave as a simple tunneling barrier, suggesting that the buffer layer and graphene overlayers play a direct role in the decay of IPS electrons.

  9. Effects of buffer layers on the structural and electronic properties of InSb films

    SciTech Connect

    Weng, X.; Rudawski, N.G.; Wang, P.T.; Goldman, R.S.; Partin, D.L.; Heremans, J.

    2005-02-15

    We have investigated the effects of various buffer layers on the structural and electronic properties of n-doped InSb films. We find a significant decrease in room-temperature electron mobility of InSb films grown on low-misfit GaSb buffers, and a significant increase in room-temperature electron mobility of InSb films grown on high-misfit InAlSb or step-graded GaSb+InAlSb buffers, in comparison with those grown directly on GaAs. Plan-view transmission electron microscopy (TEM) indicates a significant increase in threading dislocation density for InSb films grown on the low-misfit buffers, and a significant decrease in threading dislocation density for InSb films grown on high-misfit or step-graded buffers, in comparison with those grown directly on GaAs. Cross-sectional TEM reveals the role of the film/buffer interfaces in the nucleation (filtering) of threading dislocations for the low-misfit (high-misfit and step-graded) buffers. A quantitative analysis of electron mobility and carrier-concentration dependence on threading dislocation density suggests that electron scattering from the lattice dilation associated with threading dislocations has a stronger effect on electron mobility than electron scattering from the depletion potential surrounding the dislocations. Furthermore, while lattice dilation is the predominant mobility-limiting factor in these n-doped InSb films, ionized impurity scattering associated with dopants also plays a role in limiting the electron mobility.

  10. Effects of buffer layers on the structural and electronic properties of InSb films

    NASA Astrophysics Data System (ADS)

    Weng, X.; Rudawski, N. G.; Wang, P. T.; Goldman, R. S.; Partin, D. L.; Heremans, J.

    2005-02-01

    We have investigated the effects of various buffer layers on the structural and electronic properties of n-doped InSb films. We find a significant decrease in room-temperature electron mobility of InSb films grown on low-misfit GaSb buffers, and a significant increase in room-temperature electron mobility of InSb films grown on high-misfit InAlSb or step-graded GaSb +InAlSb buffers, in comparison with those grown directly on GaAs. Plan-view transmission electron microscopy (TEM) indicates a significant increase in threading dislocation density for InSb films grown on the low-misfit buffers, and a significant decrease in threading dislocation density for InSb films grown on high-misfit or step-graded buffers, in comparison with those grown directly on GaAs. Cross-sectional TEM reveals the role of the film/buffer interfaces in the nucleation (filtering) of threading dislocations for the low-misfit (high-misfit and step-graded) buffers. A quantitative analysis of electron mobility and carrier-concentration dependence on threading dislocation density suggests that electron scattering from the lattice dilation associated with threading dislocations has a stronger effect on electron mobility than electron scattering from the depletion potential surrounding the dislocations. Furthermore, while lattice dilation is the predominant mobility-limiting factor in these n-doped InSb films, ionized impurity scattering associated with dopants also plays a role in limiting the electron mobility.

  11. Exploring Cd-Zn-O-S alloys for optimal buffer layers in thin-film photovoltaics

    NASA Astrophysics Data System (ADS)

    Varley, J.; He, X.; Mackie, N.; Rockett, A.; Lordi, V.

    2015-03-01

    The development of thin-film photovoltaics has largely focused on alternative absorber materials, while the choices for other layers in the solar cell stack have remained somewhat limited. In particular, cadmium sulfide (CdS) is widely used as the buffer layer in typical record devices utilizing absorbers like Cu(In,Ga)Se2 (CIGSe) or Cu2ZnSnS4 (CZTS) despite leading to a loss of solar photocurrent due to its band gap of 2.4 eV. While different buffers such as Zn(S,O,OH) are beginning to become competitive with CdS, the identification of additional wider-band gap alternatives with electrical properties comparable to or better than CdS is highly desirable. Here we use hybrid functional calculations to characterize CdxZn1-xOyS1-y candidate buffer layers in the quaternary phase space composed by Cd, Zn, O, and S. We focus on the band gaps and band offsets of the alloys to assess strategies for improving absorption losses from conventional CdS buffers while maintaining similar conduction band offsets known to facilitate good device performance. We also consider additional criteria such as lattice matching to identify regions in the composition space that may provide improved epitaxy to CIGSe and CZTS absorbers. Lastly, we incorporate our calculated alloy properties into simulations of typical CIGSe devices to identify the CdxZn1-xOyS1-y buffer compositions that lead to the best performance. This work performed under the auspices of the USDoE by LLNL under Contract DE-AC52-07NA27344 and funded by the DoE EERE through the SunShot BRIDGE program.

  12. Effect of magnetic structural processing on structure and texture of La2Zr2O7 buffer layers

    NASA Astrophysics Data System (ADS)

    Chibirova, F. Kh.; Kotina, G. V.; Bovina, E. A.; Tarasova, D. V.; Polisan, A. A.; Parkhomenko, Yu. N.

    2016-11-01

    Epitaxial CeO2 seed layer and La2Zr2O7 (LZO) buffer layers were deposited on biaxially-textured Ni-5 at.% W (NiW) tape substrate by liquid-phase polymer assisted nanoparticles deposition (PAND) method. LZO layers deposited by PAND have consistently shown tilting of the c-axis toward the direction of the sample’s surface normal. A new approach increasing the sharpening of the buffer texture by magnetic structural processing (MSP) of buffer layers was tested. The LZO layers, deposited on the seed and buffer layers after MSP, have dense and smooth surface structure, and more importantly, significantly improved out-of-plane texture, compared with the LZO layers that were deposited on a layer without MSP. Transmission electron microscopy study confirmed the c-axis tilting of CeO2 and LZO layers and revealed the absence of interfaces between LZO layers which have been grown on the layers after MSP. There are very small (2-4 nm) gated pores in the single-crystal structure of LZO layers that are not typical for structure of LZO layers obtained by liquid-phase methods. Thus the LZO buffer layers can serve as an effective metal-ion diffusion barrier.

  13. Fabrication of buffer layer for YBCO coated conductor on cube textured Ag substrate

    NASA Astrophysics Data System (ADS)

    Yuasa, Toyotaka; Kurosaki, Haruhiko; Kim, SeokBeom; Maeda, Toshihiko; Higashiyama, Kazutoshi; Hirabayashi, Izumi

    2001-08-01

    In case of the cube textured (CUTE) Ag substrate, recrystallization process of as-rolled Ag substrate in various atmosphere changed surface flatness of the substrate. When the substrate was heated in a vacuum chamber with a oxygen partial pressure of less than 1×10 -5 Torr at 600°C, the surface average roughness ( Ra) of the substrate was less than 120 nm. Then the oxygen was introduced into the vacuum chamber to fabricate CeO 2 buffer layer on the substrate by pulsed laser deposition. After the oxygen pressure reached to 50-150 mTorr, CeO 2 layer was deposited on the CUTE Ag substrate immediately. By reducing the influence of oxygen to surface roughness of the substrate, Ra of the CeO 2 buffered CUTE Ag substrate was 30 nm.

  14. Selective growth of Pb islands on graphene/SiC buffer layers

    SciTech Connect

    Liu, X. T.; Miao, Y. P.; Ma, D. Y.; Hu, T. W.; Ma, F. E-mail: kwxu@mail.xjtu.edu.cn; Chu, Paul K.; Xu, K. W. E-mail: kwxu@mail.xjtu.edu.cn

    2015-02-14

    Graphene is fabricated by thermal decomposition of silicon carbide (SiC) and Pb islands are deposited by Pb flux in molecular beam epitaxy chamber. It is found that graphene domains and SiC buffer layer coexist. Selective growth of Pb islands on SiC buffer layer rather than on graphene domains is observed. It can be ascribed to the higher adsorption energy of Pb atoms on the 6√(3) reconstruction of SiC. However, once Pb islands nucleate on graphene domains, they will grow very large owing to the lower diffusion barrier of Pb atoms on graphene. The results are consistent with first-principle calculations. Since Pb atoms on graphene are nearly free-standing, Pb islands grow in even-number mode.

  15. Ultrathin Polyaniline-based Buffer Layer for Highly Efficient Polymer Solar Cells with Wide Applicability

    NASA Astrophysics Data System (ADS)

    Zhao, Wenchao; Ye, Long; Zhang, Shaoqing; Fan, Bin; Sun, Mingliang; Hou, Jianhui

    2014-10-01

    Interfacial buffer layers often attribute the improved device performance in organic optoelectronic device. Herein, a water-soluble hydrochloric acid doped polyanilines (HAPAN) were utilized as p-type electrode buffer layer in highly efficient polymer solar cells (PSC) based on PBDTTT-EFT and several representative polymers. The PBDTTT-EFT-based conventional PSC featuring ultrathin HAPAN (1.3 nm) delivered high PCE approximately 9%, which is one of the highest values among conventional PSC devices. Moreover, ultrathin HAPAN also exhibited wide applicability in a variety of efficient photovoltaic polymers including PBDTTT-C-T, PTB7, PBDTBDD, PBTTDPP-T, PDPP3T and P3HT. The excellent performances were originated from the high transparency, small film roughness and suitable work function.

  16. Ultrathin Polyaniline-based Buffer Layer for Highly Efficient Polymer Solar Cells with Wide Applicability

    PubMed Central

    Zhao, Wenchao; Ye, Long; Zhang, Shaoqing; Fan, Bin; Sun, Mingliang; Hou, Jianhui

    2014-01-01

    Interfacial buffer layers often attribute the improved device performance in organic optoelectronic device. Herein, a water-soluble hydrochloric acid doped polyanilines (HAPAN) were utilized as p-type electrode buffer layer in highly efficient polymer solar cells (PSC) based on PBDTTT-EFT and several representative polymers. The PBDTTT-EFT-based conventional PSC featuring ultrathin HAPAN (1.3 nm) delivered high PCE approximately 9%, which is one of the highest values among conventional PSC devices. Moreover, ultrathin HAPAN also exhibited wide applicability in a variety of efficient photovoltaic polymers including PBDTTT-C-T, PTB7, PBDTBDD, PBTTDPP-T, PDPP3T and P3HT. The excellent performances were originated from the high transparency, small film roughness and suitable work function. PMID:25300365

  17. Effect of ZnO seed layer on the morphology and optical properties of ZnO nanorods grown on GaN buffer layers

    SciTech Connect

    Nandi, R. Mohan, S. Major, S. S.; Srinivasa, R. S.

    2014-04-24

    ZnO nanorods were grown by chemical bath deposition on sputtered, polycrystalline GaN buffer layers with and without ZnO seed layer. Scanning electron microscopy and X-ray diffraction show that the ZnO nanorods on GaN buffer layers are not vertically well aligned. Photoluminescence spectrum of ZnO nanorods grown on GaN buffer layer, however exhibits a much stronger near-band-edge emission and negligible defect emission, compared to the nanorods grown on ZnO buffer layer. These features are attributed to gallium incorporation at the ZnO-GaN interface. The introduction of a thin (25 nm) ZnO seed layer on GaN buffer layer significantly improves the morphology and vertical alignment of ZnO-NRs without sacrificing the high optical quality of ZnO nanorods on GaN buffer layer. The presence of a thick (200 nm) ZnO seed layer completely masks the effect of the underlying GaN buffer layer on the morphology and optical properties of nanorods.

  18. Plasmonic absorption enhancement in organic solar cells by nano disks in a buffer layer

    NASA Astrophysics Data System (ADS)

    Kim, Inho; Seok Jeong, Doo; Seong Lee, Taek; Seong Lee, Wook; Lee, Kyeong-Seok

    2012-05-01

    We demonstrate using finite-difference-time-domain calculations that embedding Ag nano disks (NDs) in the buffer layers of thin P3HT:PCBM organic solar cells can enhance optical absorption in the active layers at specific wavelength range. We show that the aspect ratio of the NDs is a key parameter for strong plasmonic absorption enhancement. Two different plasmonic absorption bands are observed stemming from optical refractive index differences among the layers surrounding the NDs in the solar cell devices. One absorption band by the surface plasmon mode localized at the interface of indium tin oxide/ND, which is undesirable for plasmonic absorption enhancement in the active layer, become negligible as the aspect ratio of the diameter-to-height increased. The other absorption band by the dipole-like surface plasmon mode, which plays a main role in enhancing the absorption in the active layer, is spectrally tunable by adjusting the aspect ratio of the NDs. The influences of diameter, height, and coverage of the NDs on optical absorption in the active layer are discussed. Embedding the optimal size NDs in the buffer layer leads to the enhanced total absorption in the 50 nm thick active layer by 16% relative to that without the NDs, and the optical absorption keeps enhanced with increasing the active layer thickness up to 90 nm. However, further increases in the active layer thickness are detrimental to absorption enhancement, which is considered to be caused by destructive interference between scattered light by the NDs and incident light.

  19. ZnS/Zn(O,OH)S-based buffer layer deposition for solar cells

    DOEpatents

    Bhattacharya, Raghu N.

    2009-11-03

    The invention provides CBD ZnS/Zn(O,OH)S and spray deposited ZnS/Zn(O,OH)S buffer layers prepared from a solution of zinc salt, thiourea and ammonium hydroxide dissolved in a non-aqueous/aqueous solvent mixture or in 100% non-aqueous solvent. Non-aqueous solvents useful in the invention include methanol, isopropanol and triethyl-amine. One-step deposition procedures are described for CIS, CIGS and other solar cell devices.

  20. Growth and characterization of CdS buffer layers by CBD and MOCVD

    SciTech Connect

    Morrone, A.A.; Huang, C.; Li, S.S.

    1999-03-01

    Thin film CdS has been widely used in thin-film photovoltaic devices. The most efficient Cu(In,&hthinsp;Ga)Se{sub 2} (CIGS) solar cells reported to date utilized a thin CdS buffer layer prepared by a reactive solution growth technique known as chemical bath deposition (CBD). Considerable effort has been directed to better understand the role and find a replacement for the CBD CdS process in CIGS-based solar cells. We reported a low temperature ({approximately}150&hthinsp;{degree}C) Metalorganic Chemical Vapor Deposition (MOCVD) CdS thin film buffer layer process for CIGS absorbers. Many prior studies have reported that CBD CdS contains a mixture of crystal structures. Recent investigations of CBD CdS thin films by ellipsometry suggested a multilayer structure. In this study we compare CdS thin films prepared by CBD and MOCVD and the effects of annealing. TED and XRD are used to characterize the crystal structure, the film microstructure is studied by HRTEM, and the optical properties are studied by Raman and spectrophotometry. All of these characterization techniques reveal superior crystalline film quality for CdS films grown by MOCVD compared to those grown by CBD. Dual Beam Optical Modulation (DBOM) studies showed that the MOCVD and CBD CdS buffer layer processes have nearly the same effect on CIGS absorbers when combined with a cadmium partial electrolyte aqueous dip. {copyright} {ital 1999 American Institute of Physics.}

  1. High performance polymer solar cells with as-prepared zirconium acetylacetonate film as cathode buffer layer

    PubMed Central

    Tan, Zhan'ao; Li, Shusheng; Wang, Fuzhi; Qian, Deping; Lin, Jun; Hou, Jianhui; Li, Yongfang

    2014-01-01

    Low-work-function active metals are commonly used as cathode in polymer solar cells (PSCs), but sensitivity of the active metals towards moisture and oxygen results in poor stability of the devices. Therefore, solution-proceessable and stable cathode buffer layer is of great importance for the application of PSCs. Here we demonstrate high performance PSCs by employing as-prepared zirconium acetylacetonate (a-ZrAcac) film spin-cast from its ethanol solution as cathode buffer layer. The PSCs based on a low bandgap polymer PBDTBDD as donor and PC60BM as acceptor with a-ZrAcac/Al cathode demonstrated an average power conversion efficiency (PCE) of 8.75% which is significantly improved than that of the devices with traditional Ca/Al cathode. The improved photovoltaic performance is benefitted from the decreased series resistance and enhanced light harvest of the PSCs with the a-ZrAcac/Al cathode. The results indicate that a-ZrAcac is a promising high performance cathode buffer layer for fabricating large area flexible PSCs. PMID:24732976

  2. Performance enhancement in inverted solar cells by interfacial modification of ZnO nanoparticle buffer layer.

    PubMed

    Ambade, Swapnil B; Ambade, Rohan B; Kim, Seojin; Park, Hanok; Yoo, Dong Jin; Leel, Soo-Hyoung

    2014-11-01

    Polymer solar cells (PSCs) have attracted increasing attention in recent years. The rapid progress and mounting interest suggest the feasibility of PSC commercialization. However, critical issues such as stability and the weak nature of their interfaces posses quite a challenge. In the context of improving stability, PSCs with inverted geometry consising of inorganic oxide layer acting as an n-buffer offer quite the panacea. Zinc oxide (ZnO) is one of the most preferred semiconducting wide band gap oxides as an efficient cathode layer that effectively extracts and transports photoelectrons from the acceptor to the conducting indium-doped tin oxide (ITO) due to its high conductivity and transparency. However, the existence of a back charge transfer from metal oxides to electron-donating conjugated polymer and poor contact with the bulk heterojunction (BHJ) active layer results in serious interfacial recombination and leads to relatively low photovoltaic performance. One approach to improving the performance and charge selectivity of these types of inverted devices consists of modifying the interface between the inorganic metal oxide (e.g., ZnO) and organic active layer using a sub-monolayer of interfacial materials (e.g., functional dyes). In this work, we demonstrate that the photovoltaic parameters of inverted solar cells comprising a thin overlayer of functional dyes over ZnO nanoparticle as an n-buffer layer are highly influenced by the anchoring groups they possess. While an inverted PSC containing an n-buffer of only ZnO exhibited an overall power conversion efficiency (PCE) of 2.87%, the devices with an interlayer of dyes containing functional cyano-carboxylic, cyano-cyano, and carboxylic groups exhibited PCE of 3.52%, 3.39%, and 3.21%, respectively, due to increased forward charge collection resulting from enhanced electronic coupling between the ZnO and BHJ active layers.

  3. Multi-filamentary REBCO tapes fabricated by scratching a buffer layer along the tape longitudinal direction

    NASA Astrophysics Data System (ADS)

    Kurihara, Chihaya; Fujita, Shinji; Nakamura, Naonori; Igarashi, Mitsunori; Iijima, Yasuhiro; Higashikawa, Kohei; Uetsuhara, Dai; Kiss, Takanobu; Iwakuma, Masataka

    2016-11-01

    A method for making multi-filamentary REBCO tapes by only scratching buffer layer was developed for coil application which requires accurate magnetic fields. By continuous Ic measurement, we found that our new multi-filamentary tape could provide almost equal Ic compared to conventional tapes. Then, using EBSD and RTR-SHPM methods, a divided structure of REBCO layer was surely confirmed. AC loss was also decreased. Furthermore, the result of delamination test of our new multi-filamentary tape showed enough mechanical property. As a result, we have succeeded in developing 100 m class multi-filamentary tape for superconducting coil.

  4. Improvement of the interfacial Dzyaloshinskii-Moriya interaction by introducing a Ta buffer layer

    SciTech Connect

    Kim, Nam-Hui; Jung, Jinyong; Cho, Jaehun; You, Chun-Yeol; Han, Dong-Soo; Kim, June-Seo Swagten, Henk J. M.

    2015-10-05

    We report systematic measurements of the interfacial Dzyaloshinskii-Moriya interaction (iDMI) by employing Brillouin light scattering in Pt/Co/AlO{sub x} and Ta/Pt/Co/AlO{sub x} structures. By introducing a tantalum buffer layer, the saturation magnetization and the interfacial perpendicular magnetic anisotropy are significantly improved due to the better interface between heavy metal and ferromagnetic layer. From the frequency shift between Stokes- and anti-Stokes spin-waves, we successively obtain considerably larger iDM energy densities (D{sub max} = 1.65 ± 0.13 mJ/m{sup 2} at t{sub Co} = 1.35 nm) upon adding the Ta buffer layer, despite the nominally identical interface materials. Moreover, the energy density shows an inverse proportionality with the Co layer thickness, which is the critical clue that the observed iDMI is indeed originating from the interface between the Pt and Co layers.

  5. A study on intermediate buffer layer of coated Fiber Bragg Grating cryogenic temperature sensors

    NASA Astrophysics Data System (ADS)

    Freitas, R.; Araujo, F.; Araujo, J.; Neumann, H.; Ramalingam, R.

    2015-12-01

    The sensor characteristics of a coated Fiber Bragg grating (FBG) thermal sensor for cryogenic temperatures depends mainly on the coating materials. The sensitivity of the coated FBG can be improved by enhancing the effective thermal strain transfer between the different layers and the bare FBG. The dual coated FBG's has a primary layer and the secondary layer. The primary coating acts as an intermediate buffer between the secondary coating and the bare FBG. The outer secondary coating is normally made of metals with high thermal expansion coefficient. In this work, a detailed study is carried out on chromium and titanium intermediate buffer layers with various coating thicknesses and combinations. To improve the sensitivity, the secondary coating layer was tested with Indium, Lead and Tin. The sensors were then calibrated in a cryogenic temperature calibration facility at Institute of Technical Physics (ITEP), Karlsruhe Institute of Technology. The sensors were subjected to several thermal cycles between 4.2 and 80 K to study the sensor performance and its thermal characteristics. The sensor exhibits a Bragg wavelength shift of 13pm at 20K. The commercially available detection equipment with a resolution of 1pm can result in a temperature resolution of 0.076 K at 20K.

  6. Growth of AlN and GaN thin films via OMVPE and gas source MBE and their characterization

    NASA Astrophysics Data System (ADS)

    Davis, Robert F.; Weeks, T. W.; Bremser, M. D.; Tanaka, S.; Kern, R. S.; Sitar, Z.; Ailey, K. S.; Perry, W. G.; Wang, C.

    1997-02-01

    Thin films of AlN and GaN are deposited primarily via the common forms of organometallic vapor phase epitaxy (OMVPE) and molecular beam epitaxy (MBE). Sapphire is the most common substrate; however, a host of materials have been used with varying degrees of success. Both growth techniques have been employed by the authors to grow AlN and GaN primarily on 6H-SiC(0001). The mismatch in atomic layer stacking sequences along the growth direction produces inversion domain boundaries in the AlN at the SiC steps; this sequence problem may discourage the nucleation of GaN. Films of AlN and GaN grown by MBE at 650°C are textured; monocrystalline films are achieved at 1050°C by this technique and OMVPE. Donor and acceptor doping of GaN has been achieved via MBE without post growth annealing. Acceptor doping in CVD material requires annealing to displace the H from the Mg and eventually remove it from the material. High brightness light emitting diodes are commercially available; however, numerous concerns regarding metal and nitrogen sources, heteroepitaxial nucleation, the role of buffer layers, surface migration rates as a function of temperature, substantial defect densities and their effect on film and device properties, ohmic and rectifying contacts, wet and dry etching and suitable gate and field insulators must and are being addressed.

  7. AlN growth on sapphire substrate by ammonia MBE

    NASA Astrophysics Data System (ADS)

    Mansurov, V. G.; Nikitin, A. Yu.; Galitsyn, Yu. G.; Svitasheva, S. N.; Zhuravlev, K. S.; Osvath, Z.; Dobos, L.; Horvath, Z. E.; Pecz, B.

    2007-03-01

    Kinetics of (0 0 0 1) Al 2O 3 surface nitridation and subsequent growth of AlN films on the sapphire substrate by ammonia molecular beam epitaxy (MBE) are investigated. Surface morphology evolution during AlN growth is studied in situ by reflection high energy electron diffraction and ex situ by atomic force microscopy. It is found that the surfaces of AlN layers thicker than 100 nm have two major features: a quite smooth background and noticeable amount of hillocks. The influence of growth conditions on the AlN surface morphology is studied in order to find a way for reducing of the hillocks density. A modification of nitridated sapphire surface by small amount of Al (1-2 monolayers) with subsequent treatment of the surface under ammonia flux is proposed. An improvement of AlN surface morphology of the layers grown on the modified surfaces is demonstrated.

  8. Formation of a Buffer Layer for Graphene on C-Face SiC{0001}

    NASA Astrophysics Data System (ADS)

    He, Guowei; Srivastava, N.; Feenstra, R. M.

    2014-04-01

    Graphene films prepared by heating the SiC surface (the C-face of the {0001} surface) in a Si-rich environment have been studied using low-energy electron diffraction (LEED) and low-energy electron microscopy. Upon graphitization, an interface with symmetry is observed by in situ LEED. After oxidation, the interface displays symmetry. Electron reflectivity measurements indicate that these interface structures arise from a graphene-like "buffer layer" that forms between the graphene and the SiC, similar to that observed on Si-face SiC. From a dynamical LEED structure calculation for the oxidized C-face surface, it is found to consist of a graphene layer sitting on top of a silicate (Si2O3) layer, with the silicate layer having the well-known structure as previously studied on bare SiC surfaces. Based on this result, the structure of the interface prior to oxidation is discussed.

  9. Development of Solution Buffer Layers for RABiTS Based YBCO Coated Conductors

    SciTech Connect

    Paranthaman, Mariappan Parans; Qiu, Xiaofeng; List III, Frederick Alyious; Zhang, Yifei; Li, Xiaoping; Sathyamurthy, Srivatsan; Thieme, C. L. H.; Rupich, M. W.

    2011-01-01

    Abstract The main objective of this research is to find a suitable alternate solution based seed layer for the standard RABiTS three-layer architecture of physical vapor deposited CeO cap/YSZ barrier/Y O seed on Ni-5%W metal tape. In the present work, we have identified CeO buffer layer as a potential replacement for Y O seeds. Using a metal-organic deposition (MOD) process, we have grown smooth, crack-free, epitaxial thin films of CeO (pure and Zr, Cu and Gd-doped) directly on biaxially textured Ni-5W substrates in short lengths. Detailed XRD studies indicate that a single epitaxial CeO phase with slightly improved out-of-plane texture compared to the texture of the underlying Ni-W substrates can be achieved in pure, undoped CeO samples. We have also demonstrated the growth of YSZ barrier layers on pure CeO seeds using sputtering. Both sputtered CeO cap layers and MOD-YBCO films were grown epitaxially on these YSZ-buffered MOD-CeO /Ni-5W substrates. High critical currents per unit width, of 264 A/cm (critical current density, of 3.3 MA/cm ) at 77 K and 0.01 T was achieved for 0.8 m thick MOD-YBCO films grown on MOD-CeO seeds. These results indicate that CeO films can be grown directly on Ni-5W substrates and still support high performance YBCO coated conductors. This work holds promise for a route for producing low-cost buffer architecture for RABiTS based YBCO coated conductors.

  10. Dummy Fill Aware Buffer Insertion after Layer Assignment Based on an Effective Estimation Model

    NASA Astrophysics Data System (ADS)

    Jia, Yanming; Cai, Yici; Hong, Xianlong

    This paper studies the impact of dummy fill for chemical mechanical polishing (CMP)-induced capacitance variation on buffer insertion based on a virtual CMP fill estimation model. Compared with existing methods, our algorithm is more feasible by performing buffer insertion not in post-process but during early physical design. Our contributions are threefold. First, we introduce an improved fast dummy fill amount estimation algorithm based on [4], and use some speedup techniques (tile merging, fill factor and amount assigning) for early estimation. Second, based on some reasonable assumptions, we present an optimum virtual dummy fill method to estimate dummy position and the effect on the interconnect capacitance. Then the dummy fill estimation model was verified by our experiments. Third, we use this model in early buffer insertion after layer assignment considering the effects of dummy fill. Experimental results verified the necessity of early dummy fill estimation and the validity of our algorithm. Buffer insertion considering dummy fill during early physical design is necessary and our algorithm is promising.

  11. Epitaxial CeO 2/MgO buffer layers on cubic textured Ni substrates for superconducting tapes

    NASA Astrophysics Data System (ADS)

    Yang, Jian; Gu, Hongwei; Hu, Guangyong; Shi, Kai; Yuan, Guansen

    Reported here is a novel epitaxial buffer layer configuration combined with MgO and CeO 2 on biaxially texture Ni substrates for high temperature superconducting (HTS) tapes. The hetero-epitaxial CeO 2/MgO/Ni structure was grown by magnetron sputtering method. After formation of the buffer layers, θ-2θ and Φ scans of x-ray diffraction were used to measure the film in-plane and out-plane orientation, respectively. The deposited CeO 2 and MgO buffer layers showed good in-plane alignment.

  12. Study of optical waveguide sensor using metamaterial as buffer layer with non-linear cladding and substrate

    NASA Astrophysics Data System (ADS)

    Kumar, Santosh; Kumari, Anamika; Raghuwanshi, Sanjeev K.

    2015-05-01

    In this paper, dispersion equation of optical waveguide using metamaterial as buffer layer with non-linear cladding and substrate is pointed. The sensitivity of TE in metamaterial optical waveguide sensor is computed mathematically. The impacts of buffer layer with non-linear cladding and substrate on metamaterial optical waveguide sensor are also tried out. The effects of various parameters on sensitivity of sensor are obtained through MATLAB. It is expected that metamaterial as buffer layer with non-linear cladding and substrate profile has a huge application in leaky fibre sensor, gas sensor and chemical sensor for oil and under grounds mining industries.

  13. Applied Learning Networks (ALN)

    DTIC Science & Technology

    2007-01-01

    AFRL-IF-RS-TR-2007-7 Final Technical Report January 2007 APPLIED LEARNING NETWORKS (ALN) University of Southern California...any other person or corporation; or convey any rights or permission to manufacture, use, or sell any patented invention that may relate to them...1-0051 4. TITLE AND SUBTITLE APPLIED LEARNING NETWORKS (ALN) 5c. PROGRAM ELEMENT NUMBER 62301E 5d. PROJECT NUMBER T981 5e. TASK NUMBER US

  14. The mechanical and tribological properties of UHMWPE loaded ALN after mechanical activation for joint replacements.

    PubMed

    Gong, Kemeng; Qu, Shuxin; Liu, Yumei; Wang, Jing; Zhang, Yongchao; Jiang, Chongxi; Shen, Ru

    2016-08-01

    Ultra-high molecular weight polyethylene (UHMWPE) loaded with alendronate sodium (ALN) has tremendous potential as an orthopeadic biomaterial for joint replacements. However, poor mechanical and tribological properties of UHMWPE-ALN are still obstacle for further application. The purpose of this study was to investigate the effect and mechanism of mechanical activation on mechanical and tribological properties of 1wt% ALN-loaded UHMWPE (UHMWPE-ALN-ma). In this study, tensile test, small punch test and reciprocating sliding wear test were applied to characterize the mechanical and tribological properties of UHMWPE-ALN-ma. Scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS) and Fourier transform infrared spectroscopy (FTIR) were employed to characterize UHMWPE-ALN-ma. Tensile test and small punch test showed that Young׳s modulus, tensile strength and work-to-failure (WTF) of UHMWPE-ALN-ma increased significantly compared to those of UHMWPE-ALN. The friction coefficients and wear factors of UHMWPE-ALN-ma both decreased significantly compared to those of UHMWPE-ALN. Mechanical activation obviously reduced type 1 (void) and type 2 (the disconnected and dislocated machining marks) fusion defects of UHMWPE-ALN-ma, which were revealed by SEM images of freeze fracture surfaces after etching and lateral surfaces of specimens after extension to fracture, respectively. It was attributed to peeled-off layers and chain scission of molecular chains of UHMWPE particles after mechanical activation, which were revealed by SEM images and FTIR spectra of UHMWPE-ALN-ma and UHMWPE-ALN, respectively. Moreover, EDS spectra revealed the more homogeneous distribution of ALN in UHMWPE-ALN-ma compared to that of UHMWPE-ALN. The present results showed that mechanical activation was a potential strategy to improve mechanical and tribological properties of UHMWPE-ALN-ma as an orthopeadic biomaterial for joint replacements. Copyright © 2016 Elsevier Ltd. All rights reserved.

  15. The effect of the MgO buffer layer thickness on magnetic anisotropy in MgO/Fe/Cr/MgO buffer/MgO(001)

    SciTech Connect

    Kozioł-Rachwał, Anna; Nozaki, Takayuki; Zayets, Vadym; Kubota, Hitoshi; Fukushima, Akio; Yuasa, Shinji; Suzuki, Yoshishige

    2016-08-28

    The relationship between the magnetic properties and MgO buffer layer thickness d was studied in epitaxial MgO/Fe(t)/Cr/MgO(d) layers grown on MgO(001) substrate in which the Fe thickness t ranged from 0.4 nm to 1.1 nm. For 0.4 nm ≤ t ≤ 0.7 nm, a non-monotonic coercivity dependence on the MgO buffer thickness was shown by perpendicular magneto-optic Kerr effect magnetometry. For thicker Fe films, an increase in the buffer layer thickness resulted in a spin reorientation transition from perpendicular to the in-plane magnetization direction. Possible origins of these unusual behaviors were discussed in terms of the suppression of carbon contamination at the Fe surface and changes in the magnetoelastic anisotropy in the system. These results illustrate a method to control magnetic anisotropy in MgO/Fe/Cr/MgO(d) via an appropriate choice of MgO buffer layer thickness d.

  16. Layer coupling and read disturbances in a buffered magnetic logic environment

    NASA Astrophysics Data System (ADS)

    Windbacher, Thomas; Makarov, Alexander; Sverdlov, Viktor; Selberherr, Siegfried

    2016-10-01

    There are two major obstacles impeding computing systems from further advancements: The power dissipation due to leakage and the energy spent for the information transfer between memory and processor(s). The first issue is commonly handled by shutting down unused circuit parts, however, when the dormant circuits are turned on again, their previous state must be recovered. This is commonly realized by retrieving the required information from the memory, which exacerbates the limited bandwidth between memory and processor(s). In order to circumvent these limitations, we have proposed a non-volatile buffered magnetic logic grid with instant-on capability. Non-volatile magnetic flip flops and spin-transfer torque majority gates are combined to a compact regular structure, which enables a small layout foot print as well as it guarantees the reduction of the information transfer due to a shared buffer. In the proposed structure the information is passed from one magnetic layer to another by first running a current through the magnetic layer to be read, which subsequently generates a magnetization orientation encoded spin-transfer torque, when the polarized electron spins enter the next layer. Since the current passing through the junction also exerts a spin-transfer torque on the read layer, its magnetization orientation could be destabilized which might cause a read disturbance. However, during our simulations it was also found out that the stray fields of neighboring layers have a non-negligible influence on the proposed copy operation. In this work we investigate these potential read disturbances in detail for a 2-bit shift register for varying stray field strength by changing the thickness of the interconnection layer. We found that for closer proximity the acting stray fields not only stabilize but also speed up the copy procedure, while for increasing interconnection layer thickness oscillating domain walls are formed and the copy operation becomes unreliable.

  17. Buffer layers for deposition of superconducting YBaCuO thin film on polycrystalline diamond

    NASA Astrophysics Data System (ADS)

    Beetz, Charles P.; Cui, G. J.; Lincoln, B. A.; Kirlin, Peter S.

    1992-09-01

    In an attempt to combine the properties of high temperature superconductors with the high thermal conductivity and low specific heat of diamond, we have explored the deposition of in- situ YBa(subscript 2)Cu(subscript 3)O(subscript 7-(delta) ) (YBCO) superconducting films on polycrystalline diamond thin films. We demonstrate for the first time superconducting YBCO films on diamond employing multiple layer buffer layer systems. Three different composite buffer layer systems were explored for this purpose: (1) Diamond/Zr/YSZ/YBCO, (2) Diamond/Si(subscript 3)N(subscript 4)/YSZ/YBCO, and (3) Diamond/SiO(subscript 2)/YSZ/YBCO. Adherent thin Zr films were deposited by dc sputtering on the diamond films at 450 to 820 degree(s)C. The yttria stabilized zirconia (YSZ) was deposited by reactive RF sputtering at 680 to 750 degree(s)C. The Si(subscript 3)N(subscript 4) and SiO(subscript 2) were also deposited by on-axis RF sputtering at 400 to 700 degree(s)C. YBCO films were grown on the buffer layers by off-axis RF sputtering at substrate temperatures between 690 degree(s)C and 750 degree(s)C. In all cases, the as-deposited YBCO films were superconducting above 77 K. This demonstration enables the fabrication of low heat capacity, fast response time bolometric far IR detectors and paves the way for the use of HTSC as a high frequency interconnect metallization on thick diamond film based multichip modules.

  18. Annealing temperature dependence of magnetic properties of CoFeB/MgO stacks on different buffer layers

    NASA Astrophysics Data System (ADS)

    Watanabe, Kyota; Fukami, Shunsuke; Sato, Hideo; Ikeda, Shoji; Matsukura, Fumihiro; Ohno, Hideo

    2017-08-01

    We investigate the annealing temperature dependence of the magnetic properties of CoFeB/MgO stacks with different buffer materials (Mo, Ta, and W). For Mo and W, bcc-crystalline and amorphous-like films are prepared by changing the deposition conditions. A relatively small saturation magnetization is maintained after annealing up to 400 °C for the samples with bcc-W, bcc-Mo, and amorphous-like Mo buffers. A small variation in magnetic dead layer thickness with annealing is observed for the samples with bcc-crystalline buffer layers. The interfacial anisotropy is found to mainly depend on the element of the buffer layer used regardless of its crystalline structure, and is larger for the samples with W and Mo buffers than those with Ta buffer. The sample with bcc-Mo buffer shows the highest robustness against annealing among the studied systems. We give a systematic picture based on the thermochemistry that can reasonably explain the observed buffer layer dependence of the variations in magnetic properties with annealing.

  19. Fibronectin layers by matrix-assisted pulsed laser evaporation from saline buffer-based cryogenic targets.

    PubMed

    Sima, F; Davidson, P; Pauthe, E; Sima, L E; Gallet, O; Mihailescu, I N; Anselme, K

    2011-10-01

    The deposition of fibronectin (FN) from saline buffer-based cryogenic targets by matrix-assisted pulsed laser evaporation (MAPLE) onto silicon substrates is reported. A uniform distribution of FN was revealed by Ponceau staining after control experiments on nitrocellulose paper. Well-organized particulates with heights from hundreds of nanometers up to more than 1 μm packed in homogeneous layers were evidenced by optical microscopy and profilometry on Si substrates. Atomic force microscopy images showed regions composed of buffer and FN aggregates forming a compact film. Comparison of infrared spectra of drop-cast and MAPLE-deposited FN confirmed the preservation of composition and showed no degradation of the protein. The protein deposition on Si was confirmed by antibody staining. Small aggregates and fluorescent fibrils were visualized by fluorescence microscopy. Superior attachment of human osteoprogenitor cells cultivated for 3 h proved the presence of stable and intact FN molecules after transfer.

  20. Influence of buffer solutions in the adsorption of human serum proteins onto layered double hydroxide.

    PubMed

    Gondim, Diego R; Cecilia, Juan A; Santos, Santângela O; Rodrigues, Thainá N B; Aguiar, José E; Vilarrasa-García, Enrique; Rodríguez-Castellón, Enrique; Azevedo, Diana C S; Silva, Ivanildo J

    2017-08-07

    The adsorption of human immunoglobulin G (IgG) and human serum albumin (HSA) on a non-calcined Mg-Al layered double hydroxide (3:1 Mg-Al LDH) was studied in batch and fixed bed experiments, focusing on the effect of buffer solution and pH over sorbent uptake. Mg-Al LDH was synthesized and characterized by X-ray diffraction (XRD), N2 adsorption-desorption isotherms at -196°C, X-ray photoelectron spectroscopy (XPS), Zero point charge (pHzpc), particle size distribution and Fourier transform infra-red (FTIR). Batch adsorption experiments were performed in order to investigate the effects of pH on IgG and HSA adsorption with different buffers: sodium acetate (ACETATE), sodium phosphate (PHOSPHATE), 3-(N-morpholino) propanesulfonic acid (MOPS), 4-(2-Hydroxyethyl)piperazine-1-ethanesulfonic acid (HEPES) and trizma-hydrochloric acid (TRIS-HCl). Maximum adsorption capacities estimated by the Langmuir model were 239mgg(-1) for IgG and 105mgg(-1) for HSA in TRIS-HCl buffer. On the other hand, the highest selectivity for IgG adsorption over HSA was obtained with buffer PHOSPHATE (pH 6.5). The maximum IgG and HSA adsorption uptake in this case were 165 and 36mgg(-1), respectively. Fixed bed experiments were carried out with both proteins using PHOSPHATE buffer (pH 6.5), which confirmed that IgG was more selectively adsorbed than HSA on Mg-Al LDH and both could be fully recovered by elution with sodium chloride (NaCl). Copyright © 2017 Elsevier B.V. All rights reserved.

  1. AlN texturing and piezoelectricity on flexible substrates for sensor applications

    SciTech Connect

    Smecca, Emanuele; Pellegrino, Giovanna; Alberti, Alessandra; Maita, Francesco; Maiolo, Luca; Fortunato, Guglielmo; Vinciguerra, Vincenzo; La Magna, Luigi; Mirabella, Salvo; Condorelli, Guglielmo G.

    2015-06-08

    We show that AlN-based piezocapacitors with relatively high piezoelectric coefficient (d{sub 33}) values (3–4 pC/N) can be fabricated on polyimide (PI) substrates at 160 °C or even at room temperature by sputtering processes. With respect to PI, a reduction of the piezoelectric performances was observed on polyethylene naphthalate (PEN). With the same approach, a d{sub 33} value as high as 8 pC/N was achieved on rigid substrates (SiO{sub 2}/Si). In all cases, a thin Al buffer layer was deposited, immediately before AlN, without breaking the vacuum in the deposition chamber, in order to preserve the interface from contaminations that would obstruct the optimal atomic stratification with the desired [0001] growth axis. The piezoelectric behavior was thus correlated to the degree of texturing of the AlN layer through the evaluation of the XRD texturing coefficients and to the morphology by means of AFM analyses. We show that a high level of roughness introduced by the PEN substrate, coupled with the effect of the substrate flexibility on the piezoelectric coefficient, reduces the impact of the AlN texturing on the d{sub 33} values.

  2. Buffer Layer Effects on Tandem InGaAs TPV Devices

    NASA Technical Reports Server (NTRS)

    Wilt, David M.; Wehrer, Rebecca J.; Maurer, William F.

    2004-01-01

    Single junction indium gallium arsenide (InGaAs) based TPV devices have demonstrated efficiencies in excess of 20% at radiator temperatures of 1058 C. Modeling suggests that efficiency improvements in single bandgap devices should continue although they will eventually plateau. One approach for extending efficiencies beyond the single bandgap limit is to follow the technique taken in the solar cell field, namely tandem TPV cells. Tandem photovoltaic devices are traditionally composed of cells of decreasing bandgap, connected electrically and optically in series. The incident light impinges upon the highest bandgap first. This device acts as a sieve, absorbing the high-energy photons, while allowing the remainder to pass through to the underlying cell(s), and so on. Tandem devices reduce the energy lost to overexcitation as well as reducing the current density (Jsc). Reduced Jsc results in lower resistive losses and enables the use of thinner and lower doped lateral current conducting layers as well as a higher pitch grid design. Fabricating TPV tandem devices utilizing InGaAs for all of the component cells in a two cell tandem necessitates the inclusion of a buffer layer in-between the high bandgap device (In0.53 Ga0.47As - 0.74eV) and the low bandgap device (In0.66Ga0.34As - 0.63eV) to accommodate the approximately 1% lattice strain generated due to the change in InGaAs composition. To incorporate only a single buffer layer structure, we have investigated the use of the indium phosphide (InP) substrate as a superstrate. Thus the high-bandgap, lattice- matched device is deposited first, followed by the buffer structure and the low-bandgap cell. The near perfect transparency of the high bandgap (1.35eV) iron-doped InP permits the device to be oriented such that the light enters through the substrate. In this paper we examine the impact of the buffer layer on the underlying lattice-matched InGaAs device. 0.74eV InGaAs devices were produced in a variety of

  3. Buffer Layer Effects on Tandem InGaAs TPV Devices

    NASA Technical Reports Server (NTRS)

    Wilt, David M.; Wehrer, Rebecca J.; Maurer, William F.

    2004-01-01

    Single junction indium gallium arsenide (InGaAs) based TPV devices have demonstrated efficiencies in excess of 20% at radiator temperatures of 1058 C. Modeling suggests that efficiency improvements in single bandgap devices should continue although they will eventually plateau. One approach for extending efficiencies beyond the single bandgap limit is to follow the technique taken in the solar cell field, namely tandem TPV cells. Tandem photovoltaic devices are traditionally composed of cells of decreasing bandgap, connected electrically and optically in series. The incident light impinges upon the highest bandgap first. This device acts as a sieve, absorbing the high-energy photons, while allowing the remainder to pass through to the underlying cell(s), and so on. Tandem devices reduce the energy lost to overexcitation as well as reducing the current density (Jsc). Reduced Jsc results in lower resistive losses and enables the use of thinner and lower doped lateral current conducting layers as well as a higher pitch grid design. Fabricating TPV tandem devices utilizing InGaAs for all of the component cells in a two cell tandem necessitates the inclusion of a buffer layer in-between the high bandgap device (In0.53 Ga0.47As - 0.74eV) and the low bandgap device (In0.66Ga0.34As - 0.63eV) to accommodate the approximately 1% lattice strain generated due to the change in InGaAs composition. To incorporate only a single buffer layer structure, we have investigated the use of the indium phosphide (InP) substrate as a superstrate. Thus the high-bandgap, lattice- matched device is deposited first, followed by the buffer structure and the low-bandgap cell. The near perfect transparency of the high bandgap (1.35eV) iron-doped InP permits the device to be oriented such that the light enters through the substrate. In this paper we examine the impact of the buffer layer on the underlying lattice-matched InGaAs device. 0.74eV InGaAs devices were produced in a variety of

  4. Regrowth of quantum cascade laser active regions on metamorphic buffer layers

    NASA Astrophysics Data System (ADS)

    Rajeev, A.; Mawst, L. J.; Kirch, J. D.; Botez, D.; Miao, J.; Buelow, P.; Kuech, T. F.; Li, Xiaoqing; Sigler, C.; Babcock, S. E.; Earles, T.

    2016-10-01

    Metamorphic buffer layers (MBLs) were used as substrates with lattice constants selected for designing and fabricating intersubband transition sources involving strained superlattices (SLs) such as Quantum Cascade Lasers (QCLs). Chemical mechanical planarization (CMP) was used to prepare the InGaAs-based MBLs for epitaxial growth. Indium enrichment of the InGaAs layer on the MBL surfaces was observed when annealed at the regrowth temperatures. This post-anneal enhancement was eliminated by including a wet-etch treatment after CMP, which results in an epi-ready surface for regrowth. Ten stages of a QCL core region structure, designed for emission at a 3.4 μm wavelength are regrown on a surface-optimized MBL. Such structures exhibit well defined X-ray diffraction pendellösung fringes, and transmission electron microscopy confirms planar superlattice interfaces with layer thicknesses that are in good agreement with the design target.

  5. Lattice-matched HfN buffer layers for epitaxy of GaN on Si

    SciTech Connect

    Armitage, Robert; Yang, Qing; Feick, Henning; Gebauer, Joerg; Weber, Eicke R.; Shinkai, Satoko; Sasaki, Katsutaka

    2002-05-08

    Gallium nitride is grown by plasma-assisted molecular-beam epitaxy on (111) and (001) silicon substrates using sputter-deposited hafnium nitride buffer layers. Wurtzite GaN epitaxial layers are obtained on both the (111) and (001) HfN/Si surfaces, with crack-free thickness up to 1.2 (mu)m. Initial results for GaN grown on the (111) surface show a photoluminescence peak width of 17 meV at 11 K, and an asymmetric x-ray rocking curve width of 20 arcmin. Wurtzite GaN on HfN/Si(001) shows reduced structural quality and peculiar low-temperature luminescence features. However, growth on the (001) surface results in nearly stress-free films, suggesting that much thicker crack-free layers could be obtained.

  6. SrO(001) on graphene: a universal buffer layer for integration of complex oxides

    NASA Astrophysics Data System (ADS)

    Ahmed, Adam; Wen, Hua; Pinchuk, Igor; Zhu, Tiancong; Kawakami, Roland

    2015-03-01

    We report the successful growth of high-quality crystalline SrO on highly-ordered pyrolytic graphite (HOPG) and single layer graphene by molecular beam epitaxy. The epitaxial SrO layers have (001) orientation as confirmed by x-ray diffraction (XRD), and atomic force microscopy measurements show rms surface roughness of optimal films to be 1.2 Å. Transport measurements of exfoliated graphene after SrO deposition show a strong dependence between the Dirac point and Sr oxidation. To show the utility of SrO as a buffer layer for complex oxide integration, we grew perovskite crystal SrTiO3 on SrO, and it was also confirmed to have (001) orientation from x-ray diffraction. This materials advancement opens the door to integration of many other complex oxides to explore novel correlated electron physics in graphene.

  7. ZnO buffer layer for metal films on silicon substrates

    SciTech Connect

    Ihlefeld, Jon

    2014-09-16

    Dramatic improvements in metallization integrity and electroceramic thin film performance can be achieved by the use of the ZnO buffer layer to minimize interfacial energy between metallization and adhesion layers. In particular, the invention provides a substrate metallization method utilizing a ZnO adhesion layer that has a high work of adhesion, which in turn enables processing under thermal budgets typically reserved for more exotic ceramic, single-crystal, or metal foil substrates. Embodiments of the present invention can be used in a broad range of applications beyond ferroelectric capacitors, including microelectromechanical systems, micro-printed heaters and sensors, and electrochemical energy storage, where integrity of metallized silicon to high temperatures is necessary.

  8. Efficient quantum dot light-emitting diodes with solution-processable molybdenum oxide as the anode buffer layer

    NASA Astrophysics Data System (ADS)

    He, Shaojian; Li, Shusheng; Wang, Fuzhi; Wang, Andrew Y.; Lin, Jun; Tan, Zhan'ao

    2013-05-01

    Quantum dot light-emitting diodes (QD-LEDs) are characterized by pure and saturated emission colors with narrow bandwidth. Optimization of the device interface is an effective way to achieve stable and high-performance QD-LEDs. Here we utilized solution-processed molybdenum oxide (MoOx) as the anode buffer layer on ITO to build efficient QD-LEDs. Using MoOx as the anode buffer layer provides the QD-LED with good Ohmic contact and a small charge transfer resistance. The device luminance is nearly independent of the thickness of the MoOx anode buffer layer. The QD-LEDs with a MoOx anode buffer layer exhibit a maximum luminance and luminous efficiency of 5230 cd m-2 and 0.67 cd A-1 for the yellow emission at 580 nm, and 7842 cd m-2 and 1.49 cd A-1 for the red emission at 610 nm, respectively.

  9. Effect of buffer layers on performance of organic photovoltaic devices based on copper phthalocyanine-perylene dye heterojunction

    NASA Astrophysics Data System (ADS)

    Signerski, R.; Jarosz, G.

    2011-12-01

    The work presents the results of research on the systems formed from thin films of copper phthalocyanine (CuPc), N-N'-dimethylperylene-3,4,9,10-dicarboximide (MePTCDI), electrodes of ITO and Ag, and from buffer layers: MoO3 at ITO and BCP at Ag. We have observed the effect of each buffer layer on voltage dependence of dark current and photocurrent, and on open circuit voltage-light intensity relationship. The system with both buffer layers exhibited the highest values of open circuit voltage and fill factor. The buffer layers improve transport of charge carriers within near-electrode regions, reduce dissociation of excitons on electrodes and reveal processes of charge carrier generation and recombination within the CuPc/MePTCDI junction.

  10. Optimization of CdS Buffer Layer for High Efficiency CIGS Solar Cells.

    PubMed

    Kim, Donguk; Jang, Yong-Jun; Jung, Ho-Sung; Kim, Minha; Baek, Dohyun; Yi, Junsin; Lee, Jaehyeong; Choi, Youngkwan

    2016-05-01

    In present work, effects of the thickness on the structural and optical properties of chemically deposited CdS thin films were investigated. In addition, we fabricated Cu(In, Ga)Se2 solar cells with various thicknesses of CdS buffer layer and optimized the thickness for a high efficiency. When the CdS thin films were thicker, the crystallinity improved but the transmittance decreased. The short-circuit current density (J(sc)) and the fill factor are the major efficiency limiting factors for the CIGS solar cells. As the thickness of the CdS buffer layer, the open-circuit voltage (V(oc)) and the fill factor increased, whereas the J(sc) slightly decreased. The improvement of the fill factor and thus efficiency resulted from larger shunt resistance. For the solar cells without a high resistive intrinsic ZnO layer, the highest efficiency was acquired at the thickness of 89 nm. With further increasing the thickness, the J(sc) decreased significantly, resulting in poor efficiency.

  11. Design of optimal buffer layers for CuInGaSe2 thin-film solar cells(Conference Presentation)

    NASA Astrophysics Data System (ADS)

    Lordi, Vincenzo; Varley, Joel B.; He, Xiaoqing; Rockett, Angus A.; Bailey, Jeff; Zapalac, Geordie H.; Mackie, Neil; Poplavskyy, Dmitry; Bayman, Atiye

    2016-09-01

    Optimizing the buffer layer in manufactured thin-film PV is essential to maximize device efficiency. Here, we describe a combined synthesis, characterization, and theory effort to design optimal buffers based on the (Cd,Zn)(O,S) alloy system for CIGS devices. Optimization of buffer composition and absorber/buffer interface properties in light of several competing requirements for maximum device efficiency were performed, along with process variations to control the film and interface quality. The most relevant buffer properties controlling performance include band gap, conduction band offset with absorber, dopability, interface quality, and film crystallinity. Control of an all-PVD deposition process enabled variation of buffer composition, crystallinity, doping, and quality of the absorber/buffer interface. Analytical electron microscopy was used to characterize the film composition and morphology, while hybrid density functional theory was used to predict optimal compositions and growth parameters based on computed material properties. Process variations were developed to produce layers with controlled crystallinity, varying from amorphous to fully epitaxial, depending primarily on oxygen content. Elemental intermixing between buffer and absorber, particularly involving Cd and Cu, also is controlled and significantly affects device performance. Secondary phase formation at the interface is observed for some conditions and may be detrimental depending on the morphology. Theoretical calculations suggest optimal composition ranges for the buffer based on a suite of computed properties and drive process optimizations connected with observed film properties. Prepared by LLNL under Contract DE-AC52-07NA27344.

  12. A pyridine-functionalized pyrazolinofullerene used as a buffer layer in polymer solar cells.

    PubMed

    Yang, Pingao; Chen, Shan; Liu, Yu; Xiao, Zuo; Ding, Liming

    2013-10-28

    A pyridine-functionalized pyrazolinofullerene (1) was synthesized in 42% yield via an improved one-pot reaction of C60, 3,6-di(2-pyridyl)-1,2,4,5-tetrazine, and water. The structure of 1 was unambiguously determined by X-ray diffraction of its single crystal. Due to the coordination capability of the functional groups on fullerene, compound 1 was used as a buffer layer to modify ZnO in inverted polymer solar cells. The power conversion efficiency was improved from 3.65% to 4.18% for inverted P3HT:PC61BM solar cells.

  13. Surface plasmon enhanced organic solar cells with a MoO3 buffer layer.

    PubMed

    Su, Zisheng; Wang, Lidan; Li, Yantao; Zhang, Guang; Zhao, Haifeng; Yang, Haigui; Ma, Yuejia; Chu, Bei; Li, Wenlian

    2013-12-26

    High-efficiency surface plasmon enhanced 1,1-bis-(4-bis(4-methyl-phenyl)-amino-phenyl)-cyclohexane:C70 small molecular bulk heterojunction organic solar cells with a MoO3 anode buffer layer have been demonstrated. The optimized device based on thermal evaporated Ag nanoparticles (NPs) shows a power conversion efficiency of 5.42%, which is 17% higher than the reference device. The improvement is attributed to both the enhanced conductivity and increased absorption due to the near-field enhancement of the localized surface plasmon resonance of Ag NPs.

  14. Effect of bathocuproine buffer layer in small molecule organic solar cells with inverted structure

    NASA Astrophysics Data System (ADS)

    Hao, Xia; Wang, Shenghao; Sakurai, Takeaki; Akimoto, Katsuhiro

    2015-04-01

    Inverted organic solar cells (OSCs) based on boron subphthalocynine chloride (SubPc) and fullerene (C60) were fabricated and the device structure was optimized by inserting a bathocuproine (C26H20N2) buffer layer. The power conversion efficiency was greatly improved from 0.8 to 1.6%. The roles of bathocuproine in this inverted device were investigated by photoluminescence and transient photovoltage/photocurrent measurements. The results show that the bathocuproine in the device not only blocks the exciton quenching, but also prohibits the build-up of charge trapping and suppresses the trap-assisted recombination.

  15. a Novel pt and Npt Mixed Igbt Having a New n-BUFFER Layer

    NASA Astrophysics Data System (ADS)

    Zhang, Fei; Luo, Shuhua; Zhang, Liang; Wang, Wei; Yu, Wen; Li, Chengfang; Sun, Xiaowei

    For the first time, a novel mixed insulated gate bipolar transistor (MIGBT) is proposed and verified by two-dimensional (2D) mixed device-circuit simulations. The structure of the proposed device is almost identical with that of the conventional IGBT, except for the buffer layer which is formed by employing the n+/n- structure, so that the trade-off relation between the conduction and switching losses is greatly improved and efficiently decoupled. Furthermore, the proposed device exhibits larger forward blocking voltage and positive temperature coefficient of the forward voltage drop, facilitating parallel integration.

  16. High-resolution electron microscopy study of Ni 81Fe 19 film with Co 33Cr 67 buffer layer

    NASA Astrophysics Data System (ADS)

    Xu, Q. Y.; Wang, Z. M.; Shen, F.; Du, Y. W.; Zhang, Z.

    2003-04-01

    The anisotropic magnetoresistance (AMR) in permalloy Ni 81Fe 19 film deposited on a 1.2 nm Co 33Cr 67 buffer layer was significantly enhanced. The high-resolution electron microscopy was used to study the microstructure of Ni 81Fe 19 film with and without Co 33Cr 67 buffer layer. It was found that Co 33Cr 67 buffer layer can induce good (1 1 1) texture, while without Co 33Cr 67 buffer layer, Ni 81Fe 19 film show randomly oriented grain structure. The Δ ρ/ ρ enhancement is attributed to the decrease in the resistivity ρ of the Ni 81Fe 19 film due to the formation of the large (1 1 1) textured grains in Ni 81Fe 19 film with Co 33Cr 67 buffer layer. However, the surface roughness of substrate may limit the (1 1 1) textured grain size and induce additional grain boundaries in Ni 81Fe 19 film with Co 33Cr 67 buffer layer, limit the enhancement of the AMR effect.

  17. Heterointegration of III-V on silicon using a crystalline oxide buffer layer

    NASA Astrophysics Data System (ADS)

    Bhatnagar, K.; Rojas-Ramirez, J. S.; Contreras-Guerrero, R.; Caro, M.; Droopad, R.

    2015-09-01

    The integration of III-V compound semiconductors with Si can combine the cost advantage and maturity of Si technology with the superior performance of III-V materials. We have achieved the heteroepitaxial growth of III-V compound semiconductors on a crystalline SrTiO3 buffer layer grown on Si(0 0 1) substrates. A two-step growth process utilizing a high temperature nucleation layer of GaAs, followed by a low-temperature GaAs layer at a higher growth rate was employed to achieve highly crystalline thick GaAs layers on the SrTiO3/Si substrates with low surface roughness as seen by AFM. The effect of the GaAs nucleation layer on different surface terminations for the SrTiO3 layer was studied for both on axis and miscut wafers, which led to the conclusion that the Sr terminated surface on miscut substrates provides the best GaAs films. Using GaAs/STO/Si as virtual substrates, we have optimized the growth of high quality GaSb using the interfacial misfit (IMF) dislocation array technique. This work can lead to the possibility of realizing infrared detectors and next-generation high mobility III-V CMOS within the existing Si substrate infrastructure.

  18. AlN and AlGaN layers grown on Si(111) substrate by mixed-source hydride vapor phase epitaxy method

    NASA Astrophysics Data System (ADS)

    Jeon, Hunsoo; Jeon, Injun; Lee, Gang Seok; Bae, Sung Geun; Ahn, Hyung Soo; Yang, Min; Yi, Sam Nyung; Yu, Young Moon; Honda, Yoshio; Sawaki, Nobuhiko; Kim, Suck-Whan

    2017-01-01

    High Al-composition AlGaN and AlN epilayers were grown directly on Si(111) substrate by a hydride vapor phase epitaxy (HVPE) method with a melted mixed source in a graphite boat set in a source zone with high temperatures of T = 700 and 800 °C, respectively. The presence of the Ga material in the mixed source of Ga and Al promoted the growth of AlN and AlGaN epilayers in the growth zone. When the temperature in the source zone was 800 °C, the crystalline quality of the AlN and AlGaN epilayers increased as the ratio of Ga to Al increased, and the optimum mix ratio of Ga to Al for the growth of AlN epilayers was approximately 0.35-0.42, obtained from a numerical fitting analysis of the X-ray diffraction (XRD) data for these epilayers. It appears that they can be grown directly by our melted-mixed-source HVPE method in a high-temperature source zone.

  19. Body centered cubic buffer layers for enhanced lateral grain growth of Co/Cu multilayers

    NASA Astrophysics Data System (ADS)

    Tsunoda, Masakiyo; Takahashi, Daisuke; Takahashi, Migaku

    2003-05-01

    The effect of buffer layers (BLs) on metallurgical microstructure and giant magnetoresistance of Co/Cu multilayers fabricated on them is discussed. The lateral grain size and the magnetoresistance (MR) ratio of multilayers are generally enlarged with changing the chemical composition of BLs toward a limiting concentration, within the range where the solid solution of body-centered-cubic (bcc) structure is formed. A guiding principle for material research for the BLs, which realize flat interfaces with large lateral grain size in the multilayers, is deduced from the correlation between the MR ratio of the multilayers and the surface energy of bcc BLs: the difference between the surface energy of BL (γS) and the interfacial energy (γSL) in Young-Dupré's equation (cos θ=(γS-γSL)/γL) should agree with the surface energy of Co layer (γL), which is deposited first on the BL.

  20. Multilayers Diamond-Like Carbon Film with Germanium Buffer Layers by Pulsed Laser Deposition

    NASA Astrophysics Data System (ADS)

    Cheng, Y.; Lu, Y. M.; Guo, Y. L.; Huang, G. J.; Wang, S. Y.; Tian, F. T.

    Multilayer diamond-like carbon film with germanium buffer layers, which was composed of several thick DLC layers and thin germanium island “layers” and named as Ge-DLC film, was prepared on the germanium substrate by ultraviolet laser. The Ge-DLC film had almost same surface roughness as the pure DLC film. Hardness of the Ge-DLC film was above 48.1GPa, which was almost the same as that of pure DLC film. Meanwhile, compared to the pure DLC film, the critical load of Ge-DLC film on the germanium substrate increased from 81.6mN to 143.8mN. Moreover, Ge-DLC film on germanium substrates had no change after fastness tests. The results showed that Ge-DLC film not only kept high hardness but also had higher critical load than that of pure DLC film. Therefore, it could be used as practical protective films.

  1. Low-Cd CIGS solar cells made with a hybrid CdS/Zn(O,S) buffer layer

    SciTech Connect

    Garris, Rebekah L.; Mansfield, Lorelle M.; Egaas, Brian; Ramanathan, Kannan

    2016-10-27

    In Cu(In,Ga)Se2 (CIGS) solar cells, CdS and Zn(O,S) buffer layers were compared with a hybrid buffer layer consisting of thin CdS followed Zn(O,S). We explore the physics of this hybrid layer that combines the standard (Cd) approach with the alternative (Zn) approach in the pursuit to unlock further potential for CIGS technology. CdS buffer development has shown optimal interface properties, whereas Zn(O,S) buffer development has shown increased photocurrent. Although a totally Cd-free solar module is more marketable, the retention of a small amount of Cd can be beneficial to achieve optimum junction properties. As long as the amount of Cd is reduced to less than 0.01% by weight, the presence of Cd does not violate the hazardous substance restrictions of the European Union (EU). We estimate the amount of Cd allowed in the EU for CIGS on both glass and stainless steel substrates, and we show that reducing Cd becomes increasingly important as substrate weights decrease. As a result, this hybrid buffer layer had reduced Cd content and a wider space charge region, while achieving equal or better solar cell performance than buffer layers of either CdS or Zn(O,S) alone.

  2. Low-Cd CIGS solar cells made with a hybrid CdS/Zn(O,S) buffer layer

    DOE PAGES

    Garris, Rebekah L.; Mansfield, Lorelle M.; Egaas, Brian; ...

    2016-10-27

    In Cu(In,Ga)Se2 (CIGS) solar cells, CdS and Zn(O,S) buffer layers were compared with a hybrid buffer layer consisting of thin CdS followed Zn(O,S). We explore the physics of this hybrid layer that combines the standard (Cd) approach with the alternative (Zn) approach in the pursuit to unlock further potential for CIGS technology. CdS buffer development has shown optimal interface properties, whereas Zn(O,S) buffer development has shown increased photocurrent. Although a totally Cd-free solar module is more marketable, the retention of a small amount of Cd can be beneficial to achieve optimum junction properties. As long as the amount of Cdmore » is reduced to less than 0.01% by weight, the presence of Cd does not violate the hazardous substance restrictions of the European Union (EU). We estimate the amount of Cd allowed in the EU for CIGS on both glass and stainless steel substrates, and we show that reducing Cd becomes increasingly important as substrate weights decrease. As a result, this hybrid buffer layer had reduced Cd content and a wider space charge region, while achieving equal or better solar cell performance than buffer layers of either CdS or Zn(O,S) alone.« less

  3. Uncovering the role of cathode buffer layer in organic solar cells

    NASA Astrophysics Data System (ADS)

    Qi, Boyuan; Zhang, Zhi-Guo; Wang, Jizheng

    2015-01-01

    Organic solar cells (OSCs) as the third generation photovoltaic devices have drawn intense research, for their ability to be easily deposited by low-cost solution coating technologies. However the cathode in conventional OSCs, Ca, can be only deposited by thermal evaporation and is highly unstable in ambient. Therefore various solution processible cathode buffer layers (CBLs) are synthesized as substitute of Ca and show excellent effect in optimizing performance of OSCs. Yet, there is still no universal consensus on the mechanism that how CBL works, which is evidently a critical scientific issue that should be addressed. In this article detailed studies are targeted on the interfacial physics at the interface between active layer and cathode (with and without treatment of a polar CBL) by using ultraviolet photoelectron spectroscopy, capacitance-voltage measurement, and impedance spectroscopy. The experimental data demonstrate that CBL mainly takes effect in three ways: suppressing surface states at the surface of active layer, protecting the active layer from being damaged by thermally evaporated cathode, and changing the energy level alignment by forming dipole moments with active layer and/or cathode. Our findings here provide a comprehensive picture of interfacial physics in devices with and without CBL.

  4. Uncovering the role of cathode buffer layer in organic solar cells

    PubMed Central

    Qi, Boyuan; Zhang, Zhi-Guo; Wang, Jizheng

    2015-01-01

    Organic solar cells (OSCs) as the third generation photovoltaic devices have drawn intense research, for their ability to be easily deposited by low-cost solution coating technologies. However the cathode in conventional OSCs, Ca, can be only deposited by thermal evaporation and is highly unstable in ambient. Therefore various solution processible cathode buffer layers (CBLs) are synthesized as substitute of Ca and show excellent effect in optimizing performance of OSCs. Yet, there is still no universal consensus on the mechanism that how CBL works, which is evidently a critical scientific issue that should be addressed. In this article detailed studies are targeted on the interfacial physics at the interface between active layer and cathode (with and without treatment of a polar CBL) by using ultraviolet photoelectron spectroscopy, capacitance-voltage measurement, and impedance spectroscopy. The experimental data demonstrate that CBL mainly takes effect in three ways: suppressing surface states at the surface of active layer, protecting the active layer from being damaged by thermally evaporated cathode, and changing the energy level alignment by forming dipole moments with active layer and/or cathode. Our findings here provide a comprehensive picture of interfacial physics in devices with and without CBL. PMID:25588623

  5. Calcium manganate: A promising candidate as buffer layer for hybrid halide perovskite photovoltaic-thermoelectric systems

    SciTech Connect

    Zhao, Pengjun; Wang, Hongguang; Kong, Wenwen; Xu, Jinbao Wang, Lei; Ren, Wei; Bian, Liang; Chang, Aimin

    2014-11-21

    We have systematically studied the feasibility of CaMnO{sub 3} thin film, an n-type perovskite, to be utilized as the buffer layer for hybrid halide perovskite photovoltaic-thermoelectric device. Locations of the conduction band and the valence band, spontaneous polarization performance, and optical properties were investigated. Results indicate the energy band of CaMnO{sub 3} can match up well with that of CH{sub 3}NH{sub 3}PbI{sub 3} on separating electron-hole pairs. In addition, the consistent polarization angle helps enlarge the open circuit voltage of the composite system. Besides, CaMnO{sub 3} film shows large absorption coefficient and low extinction coefficient under visible irradiation, demonstrating high carrier concentration, which is beneficial to the current density. More importantly, benign thermoelectric properties enable CaMnO{sub 3} film to assimilate phonon vibration from CH{sub 3}NH3PbI{sub 3}. All the above features lead to a bright future of CaMnO{sub 3} film, which can be a promising candidate as a buffer layer for hybrid halide perovskite photovoltaic-thermoelectric systems.

  6. Preparation of electron buffer layer with crystalline ZnO nanoparticles in inverted organic photovoltaic cells

    NASA Astrophysics Data System (ADS)

    Lee, Donghwan; Kang, Taeho; Choi, Yoon-Young; Oh, Seong-Geun

    2017-06-01

    Zinc oxide (ZnO) nanoparticles synthesized through sol-gel method were used to fabricate the electron buffer layer in inverted organic photovoltaic cells (OPVs) after thermal treatment. To investigate the effect of thermal treatment on the formation of crystalline ZnO nanoparticles, the amorphous ZnO nanoparticles were treated via hydrothermal method. The crystalline phase of ZnO with well-ordered structure could be obtained when the amorphous phase of ZnO was processed under hydrothermal treatment at 170 °C. The crystalline structure of ZnO thin film in inverted organic solar cell could be obtained under relatively low annealing temperature by using thermally treated ZnO nanoparticles. The OPVs fabricated by using crystalline ZnO nanoparticles for electron buffer layer exhibited higher efficiency than the conventional ZnO nanoparticles. The best power conversion efficiency (PCE) was achieved for 7.16% through the ZnO film using the crystalline ZnO nanoparticles. The proposed method to prepared ZnO nanoparticles (NPs) could effectively reduce energy consumption during the fabrication of OPVs, which would greatly contribute to advantages such as lower manufacturing costs, higher productivity and application on flexible substrates.

  7. Buffer layers on metal surfaces having biaxial texture as superconductor substrates

    DOEpatents

    Paranthaman, Mariappan; Lee, Dominic F.; Kroeger, Donald M.; Goyal, Amit

    2000-01-01

    Buffer layer architectures are epitaxially deposited on biaxially-textured rolled substrates of nickel and/or copper and their alloys for high current conductors, and more particularly buffer layer architectures such as Y.sub.2 O.sub.3 /Ni, YSZ/Y.sub.2 O.sub.3 /Ni, RE.sub.2 O.sub.3 /Ni, (RE=Rare Earth), RE.sub.2 O.sub.3 /Y.sub.2 O.sub.3 /Ni, RE.sub.2 O.sub.3 /CeO.sub.2 /Ni, and RE.sub.2 O.sub.3 /YSZ/CeO.sub.2 /Ni, Y.sub.2 O.sub.3 /Cu, YSZ/Y.sub.2 O.sub.3 /Cu, RE.sub.2 O.sub.3 /Cu, RE.sub.2 O.sub.3 /Y.sub.2 O.sub.3 /Cu, RE.sub.2 O.sub.3 /CeO.sub.2 /Cu, and RE.sub.2 O.sub.3 /YSZ/CeO.sub.2 /Cu. Deposition methods include physical vapor deposition techniques which include electron-beam evaporation, rf magnetron sputtering, pulsed laser deposition, thermal evaporation, and solution precursor approaches, which include chemical vapor deposition, combustion CVD, metal-organic decomposition, sol-gel processing, and plasma spray.

  8. Growth and superconductivity of REBCO bulk processed by a seed/buffer layer/precursor construction

    NASA Astrophysics Data System (ADS)

    Y Li, T.; Cheng, L.; Yan, S. B.; Sun, L. J.; Yao, X.; Yoshida, Y.; Ikuta, H.

    2010-12-01

    The buffer layer has been used, for the first time, in the cold-seeding melt-growth (MG) process for REBCO superconductor bulks. In this modified method, a mini pellet was inserted between the seed and the bulk precursor. Notably, the chemical contamination, from the seed material (either REBCO films or SmBCO/NdBCO crystals), was mostly absorbed by the mini pellet. Thus a uniformly high Tc REBCO bulk was readily gained. Secondly, the higher limits of the maximum processing temperature (Tmax) were evidently raised, which is promisingly beneficial for broadening the growth window and overcoming the self-nucleation in the growth of large-sized bulk. In short, the success of this work is that it protects the bulk from seed-induced contamination, and breaks the limit of Tmax caused by the intrinsic properties of the seed material. By means of this simple seed/buffer layer/precursor construction, we successfully fabricated a large single grain of GdBCO bulk superconductor with a diameter of 56 mm.

  9. Stability of optimal streaks in the buffer layer of a turbulent channel flow with variable viscosity

    NASA Astrophysics Data System (ADS)

    Patel, Ashish; Rinaldi, Enrico; Pecnik, Rene; Schlatter, Philipp; Bagheri, Shervin

    2016-11-01

    Direct Numerical Simulations (DNS) of turbulent channel flows with variable viscosity (Patel et al., 2015, PoF) show that low speed streaks in the buffer layer strengthen and are stabilized for increasing viscosity away from the wall, as they do not lift and tilt as intensely as in a constant property flow. The opposite holds for cases where viscosity decreases away from the wall. In this work, we investigate the above observation by studying the linear stability of the mean turbulent velocity profile obtained from DNS of variable viscosity flows. Examples of such studies for constant property turbulent flows include work of del Alamo & Jiménez, 2006, JFM and Pujals et al., 2009, PoF. The calculated optimal buffer layer streaks show larger transient energy growth for a case where the viscosity increases away from the wall. We further study the stability of the saturated optimal streaks by imposing a secondary sinuous perturbation and by following the nonlinear evolution of the structures in time. The present investigation will improve the understanding of the near-wall turbulence cycle for wall-bounded turbulent flows with viscosity gradients.

  10. Fabrication of YSZ buffer layer by single source MOCVD technique for YBCO coated conductor

    NASA Astrophysics Data System (ADS)

    Jun, Byung-Hyuk; Sun, Jong-Won; Kim, Ho-Jin; Lee, Dong-Wook; Jung, Choong-Hwan; Park, Soon-Dong; Kim, Chan-Joong

    2003-10-01

    Yttria stabilized zirconia (YSZ) buffer layers were deposited by a metal organic chemical vapor deposition technique using a single liquid source for the application of YBa 2Cu 3O 7- δ (YBCO) coated conductor. Y:Zr mole ratio was 0.2:0.8, and tetrahydrofuran (THF) was used as a solvent. The (1 0 0) single crystal MgO substrate was used for searching the deposition conditions. Bi-axially oriented CeO 2 and NiO films were fabricated on {1 0 0} <0 0 1> textured Ni substrate by the same method and used as templates. At a constant working pressure of 10 Torr, the deposition temperatures (660-800 °C) and oxygen flow rates (100-500 sccm) were changed to find the optimum deposition condition. The best (1 0 0) oriented YSZ film on MgO was obtained at 740 °C and O 2 flow rate of 300 sccm. For a YSZ buffer layer with this deposition condition on a CeO 2/Ni template, full width half maximum values of the in-plane ( ϕ-scan) and out-of-plane ( ω-scan) alignments were 10.6° and 9.8°, respectively. The SEM image of YSZ film on CeO 2/Ni showed surface morphologies without microcracks. The film deposition rate was about 100 nm/min.

  11. Surface preparation and homoepitaxial deposition of AlN on (0001)-oriented AlN substrates by metalorganic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Rice, A.; Collazo, R.; Tweedie, J.; Dalmau, R.; Mita, S.; Xie, J.; Sitar, Z.

    2010-08-01

    Chemical surface treatments were conducted on mechanically polished (MP) and chemomechanically polished (CMP) (0001)-oriented single crystalline aluminum nitride (AlN) substrates to determine a surface preparation procedure for the homoepitaxial deposition of AlN epitaxial layers by metalorganic chemical vapor deposition. MP AlN substrates characterized by atomic force microscopy exhibited 0.5 nm rms roughness and polishing scratches, while CMP AlN substrates exhibited 0.1 nm rms roughness and were scratch-free. X-ray photoelectron spectroscopy analysis of MP and CMP AlN substrates indicated the presence of a surface hydroxide layer composed of mixed aluminum oxide hydroxide and aluminum trihydroxide. Wet etching with sulfuric and phosphoric acid mixtures reduced the amount of surface hydroxide. Ammonia annealing at 1250 °C converted the substrate hydroxide layer to AlN and increased the rms roughness of MP and CMP AlN substrates to 2.2 nm and 0.2 nm, respectively. AlN epitaxial layers were deposited at 1100-1250 °C under 20 Torr total pressure with a V/III ratio of 180-300 in either N2 or H2 diluent. High-resolution x-ray diffraction measurements revealed that AlN epitaxial layers deposited on MP substrates were strained due to nucleation and coalescence of AlN grains on the mechanically damaged surfaces. AlN deposited on CMP substrates was epitaxial and strain-free. Thermodynamic models for nitridation and AlN deposition were also proposed and evaluated.

  12. Evaluation of AlGaN/GaN metal-oxide-semicondutor high-electron mobility transistors with plasma-enhanced atomic layer deposition HfO2/AlN date dielectric for RF power applications

    NASA Astrophysics Data System (ADS)

    Chiu, Yu Sheng; Luc, Quang Ho; Lin, Yueh Chin; Chien Huang, Jui; Dee, Chang Fu; Yeop Majlis, Burhanuddin; Chang, Edward Yi

    2017-09-01

    A plasma enhanced atomic layer deposition (PEALD) HfO2/AlN dielectric stack was used as the gate dielectric for AlGaN/GaN metal-oxide-semiconductor high-electron-mobility transistors (MOS-HEMTs) for high-frequency power device applications. The capacitance-voltage (C-V) curves of the HfO2/AlN/GaN MOS capacitor (MOSCAP) showed a small frequency dispersion along with a very small hysteresis (˜50 mV). Moreover, the interface trap density (D it) was calculated to be 2.7 × 1011 cm-2 V-1 s-1 at 150 °C. Using PEALD-AlN as the interfacial passivation layer (IPL), the drain current of the HfO2/AlN MOS-HEMTs increased by about 46% and the gate leakage current decreased by six orders of magnitude as compared with those of the conventional Schottky gate AlGaN/GaN HEMTs processed using the same epitaxial wafer. The 0.3-µm-gate-length HfO2/AlN/AlGaN/GaN MOS-HEMTs demonstrated a 2.88 W/mm output power, a 23 dB power gain, a 30.2% power-added efficiency at 2.4 GHz, and an improved device linearity as compared with the conventional AlGaN/GaN HEMTs. The third-order intercept point at the output (OIP3) of the MOS-HEMTs was 28.4 as compared with that of 26.5 for the conventional GaN HEMTs. Overall, the MOS-HEMTs with a HfO2/AlN gate stack showed good potential for high-linearity RF power device applications.

  13. MIS and MFIS Devices: DyScO3 as a gate-oxide and buffer-layer

    NASA Astrophysics Data System (ADS)

    Melgarejo, R.; Karan, N. K.; Saavedra-Arias, J.; Pradhan, D. K.; Thomas, R.; Katiyar, R. S.

    2008-03-01

    Metal-Ferroelectric-Insulator-Semiconductor (MFIS) structure is of importance in nonvolatile memories, as insulating buffer layer that prevents interdiffusion between the ferroelectric (FE) and the Si substrate. However, insulating layer has some disadvantages viz. generation of depolarization field in FE film and increase of operation voltage. To overcome this, it is important to find a FE with low ɛr (compared to normal FE) and an insulating buffer layer with high ɛr (compared to ɛr = 3.9 of SiO2). High-k materials viz. LaAlO3, SiN, HfO2, HfAlO etc. have been studied as buffer layers in the MFIS structures and as gate-oxide in metal-insulator-silicon (MIS). Recently, a novel gate dielectric material, DyScO3 was considered and studies indicate that crystallization temperature significantly increased and the film on Si remained amorphous even at 1000 C annealing. Considering the requirements on crystallization temperature, ɛr, electrical stability for high-k buffer layers, DyScO3 seems to be very promising for future MFIS device applications. Therefore, the evaluations of MOCVD grown DyScO3 as gate-oxide for MIS and the buffer layers for Bi3.25La0.75Ti3O12 based MFIS structures are presented.

  14. Growth and characterization aluminum gallium nitride/gallium nitride heterostructures on silicon(111) wafers using various buffer layers

    NASA Astrophysics Data System (ADS)

    Venugopal, Rajesh

    Devices based on nitride wide bandgap semiconductors are suitable for several promising applications such as blue lasers, LEDs, HEMTs etc. Due to the absence of bulk nitride crystals, nitride films are grown on lattice mismatched substrates like Al2O3 and 6H-SiC. However from a cost and integration standpoint silicon would be the substrate of choice for the growth of these materials. Nitride heterostructure growth on large area Si(111) is hence attempted by Metal Organic Chemical Vapor Deposition (MOCVD) in an modified AIX 200/4 system. The large lattice and thermal mismatch prevents the direct deposition of GaN on Si and also causes GaN layers grown on Si to crack severely. It is hence necessary to use buffer layers to alleviate this lattice and thermal mismatch. Several buffer layer schemes are used for this purpose. The crystal quality of the AlGaN/GaN heterostructures grown under various conditions on these buffers are studied using several methods like Photoluminescence, X-ray diffraction, Electron Microscopy etc. The quality of heterostructures grown on these buffers is compared in order to identify the strengths and weaknesses of each buffer and to also map the effects of process parameters on nitride layers deposited on each buffer.

  15. Buffer influence on magnetic dead layer, critical current, and thermal stability in magnetic tunnel junctions with perpendicular magnetic anisotropy

    NASA Astrophysics Data System (ADS)

    Frankowski, Marek; Żywczak, Antoni; Czapkiewicz, Maciej; Zietek, Sławomir; Kanak, Jarosław; Banasik, Monika; Powroźnik, Wiesław; Skowroński, Witold; Checiński, Jakub; Wrona, Jerzy; Głowiński, Hubert; Dubowik, Janusz; Ansermet, Jean-Philippe; Stobiecki, Tomasz

    2015-06-01

    We present a detailed study of Ta/Ru-based buffers and their influence on features crucial from the point of view of applications of Magnetic Tunnel Junctions (MTJs) such as critical switching current and thermal stability. We study buffer/FeCoB/MgO/Ta/Ru and buffer/MgO/FeCoB/Ta/Ru layers, investigating the crystallographic texture, the roughness of the buffers, the magnetic domain pattern, the magnetic dead layer thickness, and the perpendicular magnetic anisotropy fields for each sample. Additionally, we examine the effect of the current induced magnetization switching for complete nanopillar MTJs with lateral dimensions of 270 × 180 nm. Buffer Ta 5/Ru 10/Ta 3 (thicknesses in nm), which has the thickest dead layer, exhibits a much larger thermal stability factor (63 compared to 32.5) while featuring a slightly lower critical current density value (1.25 MA/cm2 compared to 1.5 MA/cm2) than the buffer with the thinnest dead layer Ta 5/Ru 20/Ta 5. We can account for these results by considering the difference in damping which compensates for the difference in the switching barrier heights.

  16. Optimal Cu buffer layer thickness for growing epitaxial Co overlayers on Si(111)7 x 7

    SciTech Connect

    Ivanov, Yu. P.; Zotov, A. V.; Ilin, A. I.; Davydenko, A. V.

    2011-10-15

    Using scanning tunneling microscopy, reflection high energy diffraction and magnetic optical Kerr effect measurements, growth mode and the magnetic properties of epitaxial Co films on Si(111) with epitaxial Cu(111) buffer layers of various thicknesses have been studied. The strained 3.5-monolayer-thick Cu/Si(111) film has been found to be an optimal buffer, in which case an almost ideal layer-by-layer like growth of Co is observed up to six Co monolayers, due to a negligible lattice mismatch. The coercivity of Co films grown in this layer-by-layer like fashion has been determined to be about 10 Oe, testifying to the high quality of the formed Co film and Co/Cu interface. Changeover of the Co film growth mode from layer-by-layer like to multilayer has been found to result in the transition of the film magnetic properties from isotropic to markedly uniaxially anisotropic.

  17. The role of Ag buffer layer in Fe islands growth on Ge (111) surfaces

    SciTech Connect

    Fu, Tsu-Yi Wu, Jia-Yuan; Jhou, Ming-Kuan; Hsu, Hung-Chan

    2015-05-07

    Sub-monolayer iron atoms were deposited at room temperature on Ge (111)-c(2 × 8) substrates with and without Ag buffer layers. The behavior of Fe islands growth was investigated by using scanning tunneling microscope (STM) after different annealing temperatures. STM images show that iron atoms will cause defects and holes on substrates at room temperature. As the annealing temperature rises, iron atoms pull out germanium to form various kinds of alloyed islands. However, the silver layer can protect the Ag/Ge(111)-(√3×√3) reconstruction from forming defects. The phase diagram shows that ring, dot, and triangular defects were only found on Ge (111)-c(2 × 8) substrates. The kinds of islands found in Fe/Ge system are similar to Fe/Ag/Ge system. It indicates that Ge atoms were pulled out to form islands at high annealing temperatures whether there was a Ag layer or not. But a few differences in big pyramidal or strip islands show that the silver layer affects the development of islands by changing the surface symmetry and diffusion coefficient. The structure characters of various islands are also discussed.

  18. Artificially MoO3 graded ITO anodes for acidic buffer layer free organic photovoltaics

    NASA Astrophysics Data System (ADS)

    Lee, Hye-Min; Kim, Seok-Soon; Kim, Han-Ki

    2016-02-01

    We report characteristics of MoO3 graded ITO anodes prepared by a RF/DC graded sputtering for acidic poly(3,4-ethylene dioxylene thiophene):poly(styrene sulfonic acid) (PEDOT:PSS)-free organic solar cells (OSCs). Graded sputtering of the MoO3 buffer layer on top of the ITO layer produced MoO3 graded ITO anodes with a sheet resistance of 12.67 Ω/square, a resistivity of 2.54 × 10-4 Ω cm, and an optical transmittance of 86.78%, all of which were comparable to a conventional ITO anode. In addition, the MoO3 graded ITO electrode showed a greater work function of 4.92 eV than that (4.6 eV) of an ITO anode, which is beneficial for hole extraction from an organic active layer. Due to the high work function of MoO3 graded ITO electrodes, the acidic PEDOT:PSS-free OSCs fabricated on the MoO3 graded ITO electrode exhibited a power conversion efficiency 3.60% greater than that of a PEDOT:PSS-free OSC on the conventional ITO anode. The successful operation of PEDOT:PSS-free OSCs indicates simpler fabrication steps for cost-effective OSCs and elimination of interfacial reactions caused by the acidic PEDOT:PSS layer for reliable OSCs.

  19. Semi-insulating Sn-Zr-O: Tunable resistance buffer layers

    SciTech Connect

    Barnes, Teresa M.; Burst, James M.; Reese, Matthew O.; Perkins, Craig L.

    2015-03-02

    Highly resistive and transparent (HRT) buffer layers are critical components of solar cells and other opto-electronic devices. HRT layers are often undoped transparent conducting oxides. However, these oxides can be too conductive to form an optimal HRT. Here, we present a method to produce HRT layers with tunable electrical resistivity, despite the presence of high concentrations of unintentionally or intentionally added dopants in the film. This method relies on alloying wide-bandgap, high-k dielectric materials (e.g., ZrO{sub 2}) into the host oxide to tune the resistivity. We demonstrate Sn{sub x}Zr{sub 1−x}O{sub 2}:F films with tunable resistivities varying from 0.001 to 10 Ω cm, which are controlled by the Zr mole fraction in the films. Increasing Zr suppresses carriers by expanding the bandgap almost entirely by shifting the valence-band position, which allows the HRT layers to maintain good conduction-band alignment for a low-resistance front contact.

  20. Effects of Cd-free buffer layer for CuInSe{sub 2} thin-film solar cells

    SciTech Connect

    Nii, T.; Sugiyama, I.; Kase, T.; Sato, M.; Kaniyama, Y.; Kuriyagawa, S.; Kushiya, K.; Takeshita, H.

    1994-12-31

    ZnO buffer layer by a chemical-bath deposition (CBD) method is developed in this study to improve the interface quality between n-ZnO window layer and p-CuInSe{sub 2} (CIS) thin-film absorber in CIS thin-film solar cells as one of the approaches to the fabrication of Cd-free thin-film solar cells. The optimization of the fabrication conditions of CBD-ZnO leads to the efficiency of about 10%. These results indicate the CBD-ZnO buffer layer has rather high capability to fabricate high-efficiency CIS thin-film solar cells.

  1. Performance improvement of MEH-PPV:PCBM solar cells using bathocuproine and bathophenanthroline as the buffer layers

    NASA Astrophysics Data System (ADS)

    Liu Xiao, Dong; Zhao, Su-Ling; Xu, Zheng; Zhang, Fu-Jun; Zhang, Tian-Hui; Gong, Wei; Yan, Guang; Kong, Chao; Wang, Yong-Sheng; Xu, Xu-Rong

    2011-06-01

    In this work, bathocuproine (BCP) and bathophenanthroline (Bphen), commonly used in small-molecule organic solar cells (OSCs), are adopted as the buffer layers to improve the performance of the polymer solar cells (PSCs) based on poly(2-methoxy-5-(2-ethylhexyloxy)-1,4-phenylenevinylene) (MEH-PPV): [6,6]-phenyl-C61-butyric acid methyl ester (PCBM) bulk heterojunction. By inserting BCP or Bphen between the active layer and the top cathode, all the performance parameters are dramatically improved. The power conversion efficiency is increased by about 70% and 120% with 5-nm BCP and 12-nm Bphen layers, respectively, when compared with that of the devices without any buffer layer. The performance enhancement is attributed to BCP or Bphen (i) increasing the optical field, and hence the absorption in the active layer, (ii) effectively blocking the excitons generated in MEH-PPV from quenching at organic/aluminum (Al) interface due to the large band-gap of BCP or Bphen, which results in a significant reduction in series resistance (Rs), and (iii) preventing damage to the active layer during the metal deposition. Compared with the traditional device using LiF as the buffer layer, the BCP-based devices show a comparable efficiency, while the Bphen-based devices show a much larger efficiency. This is due to the higher electron mobility in Bphen than that in BCP, which facilitates the electron transport and extraction through the buffer layer to the cathode.

  2. Dislocation annihilation in regrown GaN on nanoporous GaN template with optimization of buffer layer growth

    NASA Astrophysics Data System (ADS)

    Soh, C. B.; Hartono, H.; Chow, S. Y.; Chua, S. J.; Fitzgerald, E. A.

    2007-01-01

    Nanoporous GaN template has been fabricated by electrochemical etching to give hexagonal pits with nanoscale pores of size 20-50nm in the underlying grains. The effect of GaN buffer layer grown at various temperatures from 650to1015°C on these as-fabricated nanopores templates is investigated by transmission electron microscopy. The buffer layer grown at the optimized temperature of 850°C partially fill up the pores and voids with annihilation of threading dislocations, serving as an excellent template for high-quality GaN growth. This phenomenon is, however, not observed for the samples grown with other temperature buffer layers. Micro-Raman measurements show significant strain relaxation and improvement in the crystal quality of the overgrown GaN layer on nanoporous GaN template as compared to overgrown on conventional GaN template.

  3. In situ synthesis of MOF membranes on ZnAl-CO3 LDH buffer layer-modified substrates.

    PubMed

    Liu, Yi; Wang, Nanyi; Pan, Jia Hong; Steinbach, Frank; Caro, Jürgen

    2014-10-15

    We develop here a urea hydrolysis method to in situ prepare asymmetric ZnAl-CO3 layered double hydroxide (LDH) buffer layers with various stable equilibrium morphology on porous Al2O3 substrates. In particular it is found that well-intergrown ZIF-8 membranes can be directly synthesized on the ZnAl-CO3 LDH buffer layer-modified substrates, owing to the specific metal-imidazole interaction between ZnAl-CO3 LDHs and ZIF-8. Other Zn-based MOF membranes, like ZIF-7 and ZIF-90, can also be synthesized with this method. Our finding demonstrates that LDH buffer layer represents a new concept for substrate modification.

  4. Theoretical simulation of performances in CIGS thin-film solar cells with cadmium-free buffer layer

    NASA Astrophysics Data System (ADS)

    Luo, Kang; Sun, Yulin; Zhou, Liyu; Wang, Fang; Wu, Fang

    2017-08-01

    Copper indium gallium selenium (CIGS) thin film solar cells have become one of the hottest topics in solar energy due to their high photoelectric transformation efficiency. To real applications, CIGS thin film is covered by the buffer layer and absorption layer. Traditionally, cadmium sulfide (CdS) is inserted into the middle of the window layer (ZnO) and absorption layer (CIGS) as a buffer layer. However, the application of the GIGS/CdS thin film solar cells has been limited because of the environmental pollution resulting from the toxic cadmium atom. Although zinc sulfide (ZnS) has been proposed to be one of the candidates, the performance of such battery cells has not been investigated. Here, in this paper, we systematically study the possibility of using zinc sulfide (ZnS) as a buffer layer. By including the effects of thickness, concentration of a buffer layer, intrinsic layer and the absorbing layer, we find that photoelectric transformation efficiency of ZnO/ZnS(n)/CIGS(i)/CIGS(p) solar cell is about 17.22%, which is qualified as a commercial solar cell. Moreover, we also find that the open-circuit voltage is ∼0.60 V, the short-circuit current is ∼36.99 mA/cm2 and the filled factor is ∼77.44%. Therefore, our results suggest that zinc sulfide may be the potential candidate of CdS as a buffer layer. Project supported by the NSF of Jiangsu Province (No. BK20131420), the Postgraduate Innovation Project of Jiangsu Province (No. KYLX15_0926), and the NJFU Outstanding Young Scholars Funding.

  5. Effect of Reaction Temperature of CdS Buffer Layers by Chemical Bath Deposition Method.

    PubMed

    Kim, Hye Jin; Kim, Chae-Woong; Jung, Duk Young; Jeong, Chaehwan

    2016-05-01

    This study investigated CdS deposition on a Cu(In,Ga)Se2 (CIGS) film via chemical bath deposition (CBD) in order to obtain a high-quality optimized buffer layer. The thickness and reaction temperature (from 50 degrees C to 65 degrees C) were investigated, and we found that an increase in the reaction temperature during CBD, resulted in a thicker CdS layer. We obtained a thin film with a thickness of 50 nm at a reaction temperature of 60 degrees C, which also exhibited the highest photoelectric conversion efficiency for use in solar cells. Room temperature time-resolved photoluminescence (TR-PL) measurements were performed on the Cu(In,Ga)Se2 (CIGS) thin film and CdS/CIGS samples to determine the recombination process of the photo-generated minority carrier. The device performance was found to be dependent on the thickness of the CdS layer. As the thickness of the CdS increases, the fill factor and the series resistance increased to 61.66% and decreased to 8.35 Ω, respectively. The best condition was observed at a reaction temperature of 60 degrees C, and its conversion efficiency was 12.20%.

  6. Proactive Retransmission and Buffer Management for Layered Video Transmission over Wireless Channel

    NASA Astrophysics Data System (ADS)

    Uchida, Yusuke; Sunahara, Sei; Itakura, Eisaburo; Masuyama, Hiroyuki; Kasahara, Shoji; Takahashi, Yutaka

    Hybrid FEC/ARQ, which is a mixture of forward error correction (FEC) and automatic repeat request (ARQ), is a well-known technique aiming for packet-loss recovery to guarantee quality of service (QoS) for real-time communications. In this paper, focusing on layered video transmission over wireless network environment, we propose a proactive retransmission scheme for hybrid FEC/ARQ. In the proposed scheme, a receiver host periodically sends probe packets to a sender host in order to check wireless channel state. If the sender host does not receive any probe packet during a pre-specified interval, it regards the wireless channel as being in burst loss state, and it proactively retransmits packets expected to be lost during the burst loss period. The buffer management associated with layered video coding is also taken into consideration. The performance of the proposed scheme is investigated by simulation. Numerical examples show that the proposed scheme transmits packets of the base layer more successfully than the conventional FEC/ARQ.

  7. R.F. Sputtering Deposition of Buffer Layers for Si/YBCO Integrated Microelectronics

    NASA Astrophysics Data System (ADS)

    Rombolà, G.; Ballarini, V.; Chiodoni, A.; Gozzelino, L.; Mezzetti, E.; Minetti, B.; Pirri, C. F.; Tresso, E.; Camerlingo, C.

    The aim of the present work is the optimization of the Si/buffer-layer/YBCO multilayer deposition process so as to grow superconducting films of quality suitable for device applications. The structural properties of the Si/CeO2 system, obtained by RF magnetron sputtering of CeO2 targets in Ar atmosphere, have been studied. More than 50 films have been deposited and some of them submitted to post-deposition annealing treatments both in N2 and O2 atmospheres. The presence of an unwanted amorphous SiO2 layer at the Si/CeO2 interface compromises the YBCO c-axis orientation, and therefore the sharpness of the R versus T transition. A newly designed deposition system has been realized: it has been specially conceived for obtaining bi- and tri-layers, adopting two targets in YSZ and CeO2, respectively. Results on YSZ/Si and CeO2/YSZ/Si systems obtained with the new machine are presented and discussed: (100) oriented YSZ films with nominal thickness of 40 nm have been obtained. The CeO2 film subsequently deposited has the desired (100) orientation. The YBCO film, in the final YBCO/YSZ/CeO2/Si configuration, is c-axis oriented.

  8. Direct electron injection into an oxide insulator using a cathode buffer layer

    PubMed Central

    Lee, Eungkyu; Lee, Jinwon; Kim, Ji-Hoon; Lim, Keon-Hee; Seok Byun, Jun; Ko, Jieun; Dong Kim, Young; Park, Yongsup; Kim, Youn Sang

    2015-01-01

    Injecting charge carriers into the mobile bands of an inorganic oxide insulator (for example, SiO2, HfO2) is a highly complicated task, or even impossible without external energy sources such as photons. This is because oxide insulators exhibit very low electron affinity and high ionization energy levels. Here we show that a ZnO layer acting as a cathode buffer layer permits direct electron injection into the conduction bands of various oxide insulators (for example, SiO2, Ta2O5, HfO2, Al2O3) from a metal cathode. Studies of current–voltage characteristics reveal that the current ohmically passes through the ZnO/oxide-insulator interface. Our findings suggests that the oxide insulators could be used for simply fabricated, transparent and highly stable electronic valves. With this strategy, we demonstrate an electrostatic discharging diode that uses 100-nm SiO2 as an active layer exhibiting an on/off ratio of ∼107, and protects the ZnO thin-film transistors from high electrical stresses. PMID:25864642

  9. Compact hematite buffer layer as a promoter of nanorod photoanode performances

    NASA Astrophysics Data System (ADS)

    Milan, R.; Cattarin, S.; Comisso, N.; Baratto, C.; Kaunisto, K.; Tkachenko, N. V.; Concina, I.

    2016-10-01

    The effect of a thin α-Fe2O3 compact buffer layer (BL) on the photoelectrochemical performances of a bare α-Fe2O3 nanorods photoanode is investigated. The BL is prepared through a simple spray deposition onto a fluorine-doped tin oxide (FTO) conducting glass substrate before the growth of a α-Fe2O3 nanorods via a hydrothermal process. Insertion of the hematite BL between the FTO and the nanorods markedly enhances the generated photocurrent, by limiting undesired losses of photogenerated charges at the FTO||electrolyte interface. The proposed approach warrants a marked improvement of material performances, with no additional thermal treatment and no use/dispersion of rare or toxic species, in agreement with the principles of green chemistry.

  10. Compact hematite buffer layer as a promoter of nanorod photoanode performances

    PubMed Central

    Milan, R.; Cattarin, S.; Comisso, N.; Baratto, C.; Kaunisto, K.; Tkachenko, N. V.; Concina, I.

    2016-01-01

    The effect of a thin α-Fe2O3 compact buffer layer (BL) on the photoelectrochemical performances of a bare α-Fe2O3 nanorods photoanode is investigated. The BL is prepared through a simple spray deposition onto a fluorine-doped tin oxide (FTO) conducting glass substrate before the growth of a α-Fe2O3 nanorods via a hydrothermal process. Insertion of the hematite BL between the FTO and the nanorods markedly enhances the generated photocurrent, by limiting undesired losses of photogenerated charges at the FTO||electrolyte interface. The proposed approach warrants a marked improvement of material performances, with no additional thermal treatment and no use/dispersion of rare or toxic species, in agreement with the principles of green chemistry. PMID:27733756

  11. Inverted Organic Solar Cells with Improved Performance using Varied Cathode Buffer Layers

    NASA Astrophysics Data System (ADS)

    Guan, Zhi-qiang; Yu, Jun-sheng; Zang, Yue; Zeng, Xing-xin

    2012-10-01

    Organic solar cells with inverted planar heterojunction structure based on subphthalocyanine and C60 were fabricated using several kinds of materials as cathode buffer layer (CBL), including tris-8-hydroxy-quinolinato aluminum (Alq3), bathophenanthroline (Bphen), bathocuproine, 2,3,8,9,14,15-hexakis-dodecyl-sulfanyl-5,6,11,12,17,18-hexaazatrinaphthylene (HATNA), and an inorganic compound of Cs2CO3. The influence of the lowest unoccupied molecular orbital level and the electron mobility of organic CBL on the solar cells performance was compared. The results showed that Alq3, Bphen, and HATNA could significantly improve the device performance. The highest efficiency was obtained from device with annealed HATNA as CBL and increased for more than 7 times compared with device without CBL. Furthermore, the simulation results with space charge-limited current theory indicated that the Schottky barrier at the organic/electrode interface in inverted OSC structure was reduced for 27% by inserting HATNA CBL.

  12. Interlaced, Nanostructured Interface with Graphene Buffer Layer Reduces Thermal Boundary Resistance in Nano/Microelectronic Systems.

    PubMed

    Tao, Lei; Theruvakkattil Sreenivasan, Sreeprasad; Shahsavari, Rouzbeh

    2017-01-11

    Improving heat transfer in hybrid nano/microelectronic systems is a challenge, mainly due to the high thermal boundary resistance (TBR) across the interface. Herein, we focus on gallium nitride (GaN)/diamond interface-as a model system with various high power, high temperature, and optoelectronic applications-and perform extensive reverse nonequilibrium molecular dynamics simulations, decoding the interplay between the pillar length, size, shape, hierarchy, density, arrangement, system size, and the interfacial heat transfer mechanisms to substantially reduce TBR in GaN-on-diamond devices. We found that changing the conventional planar interface to nanoengineered, interlaced architecture with optimal geometry results in >80% reduction in TBR. Moreover, introduction of conformal graphene buffer layer further reduces the TBR by ∼33%. Our findings demonstrate that the enhanced generation of intermediate frequency phonons activates the dominant group velocities, resulting in reduced TBR. This work has important implications on experimental studies, opening up a new space for engineering hybrid nano/microelectronics.

  13. Depth distribution of the strain in the GaN layer with low-temperature AlN interlayer on Si(111) substrate studied by Rutherford backscattering/channeling

    NASA Astrophysics Data System (ADS)

    Lu, Y.; Cong, G. W.; Liu, X. L.; Lu, D. C.; Wang, Z. G.; Wu, M. F.

    2004-12-01

    The depth distribution of the strain-related tetragonal distortion eT in the GaN epilayer with low-temperature AlN interlayer (LT-AlN IL) on Si(111) substrate is investigated by Rutherford backscattering and channeling. The samples with the LT-AlN IL of 8 and 16 nm thickness are studied, which are also compared with the sample without the LT-AlN IL. For the sample with 16-nm-thick LT-AlN IL, it is found that there exists a step-down of eT of about 0.1% in the strain distribution. Meanwhile, the angular scan around the normal GaN ⟨0001⟩ axis shows a tilt difference about 0.01° between the two parts of GaN separated by the LT-AlN IL, which means that these two GaN layers are partially decoupled by the AlN interlayer. However, for the sample with 8-nm-thick LT-AlN IL, neither step-down of eT nor the decoupling phenomenon is found. The 0.01° decoupled angle in the sample with 16-nm-thick LT-AlN IL confirms the relaxation of the LT-AlN IL. Thus the step-down of eT should result from the compressive strain compensation brought by the relaxed AlN interlayer. It is concluded that the strain compensation effect will occur only when the thickness of the LT-AlN IL is beyond a critical thickness.

  14. Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films

    NASA Astrophysics Data System (ADS)

    Zhang, Dainan; Wen, Tianlong; Xiong, Ying; Qiu, Donghong; Wen, Qiye

    2017-07-01

    VO2 thin films were grown on silicon substrates using Al2O3 thin films as the buffer layers. Compared with direct deposition on silicon, VO2 thin films deposited on Al2O3 buffer layers experience a significant improvement in their microstructures and physical properties. By optimizing the growth conditions, the resistance of VO2 thin films can change by four orders of magnitude with a reduced thermal hysteresis of 4 °C at the phase transition temperature. The electrically driven phase transformation was measured in Pt/Si/Al2O3/VO2/Au heterostructures. The introduction of a buffer layer reduces the leakage current and Joule heating during electrically driven phase transitions. The C- V measurement result indicates that the phase transformation of VO2 thin films can be induced by an electrical field.

  15. Effect of Alloy 625 Buffer Layer on Hardfacing of Modified 9Cr-1Mo Steel Using Nickel Base Hardfacing Alloy

    NASA Astrophysics Data System (ADS)

    Chakraborty, Gopa; Das, C. R.; Albert, S. K.; Bhaduri, A. K.; Murugesan, S.; Dasgupta, Arup

    2016-04-01

    Dashpot piston, made up of modified 9Cr-1Mo steel, is a part of diverse safety rod used for safe shutdown of a nuclear reactor. This component was hardfaced using nickel base AWS ER NiCr-B alloy and extensive cracking was experienced during direct deposition of this alloy on dashpot piston. Cracking reduced considerably and the component was successfully hardfaced by application of Inconel 625 as buffer layer prior to hardface deposition. Hence, a separate study was undertaken to investigate the role of buffer layer in reducing the cracking and on the microstructure of the hardfaced deposit. Results indicate that in the direct deposition of hardfacing alloy on modified 9Cr-1Mo steel, both heat-affected zone (HAZ) formed and the deposit layer are hard making the thickness of the hard layer formed equal to combined thickness of both HAZ and deposit. This hard layer is unable to absorb thermal stresses resulting in the cracking of the deposit. By providing a buffer layer of Alloy 625 followed by a post-weld heat treatment, HAZ formed in the modified 9Cr-1Mo steel is effectively tempered, and HAZ formed during the subsequent deposition of the hardfacing alloy over the Alloy 625 buffer layer is almost completely confined to Alloy 625, which does not harden. This reduces the cracking susceptibility of the deposit. Further, unlike in the case of direct deposition on modified 9Cr-1Mo steel, dilution of the deposit by Ni-base buffer layer does not alter the hardness of the deposit and desired hardness on the deposit surface could be achieved even with lower thickness of the deposit. This gives an option for reducing the recommended thickness of the deposit, which can also reduce the risk of cracking.

  16. Solution-dispersed CuO nanoparticles anode buffer layer: Effect of ultrasonic agitation duration on photovoltaic performance

    NASA Astrophysics Data System (ADS)

    Sabri, Nasehah Syamin; Yap, Chi Chin; Yahaya, Muhammad; Salleh, Muhamad Mat; Jumali, Mohammad Hafizuddin Haji

    2016-11-01

    The performance of inverted type hybrid organic solar cell based on poly(3-hexyltheopene):[6,6]-phenyl C61-butyric acid methyl ester (P3HT:PCBM) can be improved by adding an anode buffer layer of copper oxide (CuO). CuO that serves as an electron blocking layer which could effectively reduce the charge recombination at the photoactive layer (P3HT:PCBM)/silver (Ag) interfaces. At the same time, Cuo anode buffer layer could accelerate the holes collection from the photoactive layer to the top electrode. In this study we investigated the effects of ultrasonic agitation duration in preparation of solution-dispersed CuO anode buffer layer on the performance of the devices with a configuration of fluorine tin oxide (FTO)/zinc oxide (ZnO) nanorod arrays/P3HT:PCBM/ CuO/Ag. Different durations of ultrasonic agitation (0, 5, 15 and 25 min) were used for CuO nanoparticles solution dispersion to obtain the optimum particle size distribution of CuO. It was found that the smallest average particle size of CuO was obtained by applying the ultrasonic agitation for longest duration of 25 min. The highest power conversion efficiency of 1.22% was recorded from the device incorporating with CuO anode buffer layer with the smallest average particle size. It is believed that CuO anode buffer layer with the smallest average particle size had the least agglomerates, thus leading to better film formation and contact surface area.

  17. Improved performance of polymer solar cells by using inorganic, organic, and doped cathode buffer layers

    NASA Astrophysics Data System (ADS)

    Taohong, Wang; Changbo, Chen; Kunping, Guo; Guo, Chen; Tao, Xu; Bin, Wei

    2016-03-01

    The interface between the active layer and the electrode is one of the most critical factors that could affect the device performance of polymer solar cells. In this work, based on the typical poly(3-hexylthiophene):[6,6]-phenyl C61-butyric acid methyl ester (P3HT:PCBM) polymer solar cell, we studied the effect of the cathode buffer layer (CBL) between the top metal electrode and the active layer on the device performance. Several inorganic and organic materials commonly used as the electron injection layer in an organic light-emitting diode (OLED) were employed as the CBL in the P3HT:PCBM polymer solar cells. Our results demonstrate that the inorganic and organic materials like Cs2CO3, bathophenanthroline (Bphen), and 8-hydroxyquinolatolithium (Liq) can be used as CBL to efficiently improve the device performance of the P3HT:PCBM polymer solar cells. The P3HT:PCBM devices employed various CBLs possess power conversion efficiencies (PCEs) of 3.0%-3.3%, which are ca. 50% improved compared to that of the device without CBL. Furthermore, by using the doped organic materials Bphen:Cs2CO3 and Bphen:Liq as the CBL, the PCE of the P3HT:PCBM device will be further improved to 3.5%, which is ca. 70% higher than that of the device without a CBL and ca. 10% increased compared with that of the devices with a neat inorganic or organic CBL. Project supported by the National Natural Science Foundation of China (Grant No. 61204014), the “Chenguang” Project (13CG42) supported by Shanghai Municipal Education Commission and Shanghai Education Development Foundation, China, and the Shanghai University Young Teacher Training Program of Shanghai Municipality, China.

  18. Contribution of the buffer layer to the Raman spectrum of epitaxial graphene on SiC(0001)

    NASA Astrophysics Data System (ADS)

    Fromm, F.; Oliveira, M. H., Jr.; Molina-Sánchez, A.; Hundhausen, M.; Lopes, J. M. J.; Riechert, H.; Wirtz, L.; Seyller, T.

    2013-04-01

    We report a Raman study of the so-called buffer layer with (6\\sqrt 3\\times 6\\sqrt 3)R30^{\\circ } periodicity which forms the intrinsic interface structure between epitaxial graphene and SiC(0001). We show that this interface structure leads to a non-vanishing signal in the Raman spectrum at frequencies in the range of the D- and G-band of graphene and discuss its shape and intensity. Ab initio phonon calculations reveal that these features can be attributed to the vibrational density of states of the buffer layer.

  19. Investigation of hole injection enhancement by MoO{sub 3} buffer layer in organic light emitting diodes

    SciTech Connect

    Haitao, Xu; Xiang, Zhou

    2013-12-28

    An MoO{sub 3} buffer layer prepared by thermal evaporation as hole injection layer was investigated in organic light emitting diodes. The MoO{sub 3} film inserted between the anode and hole transport layer decreased the operating voltage and enhanced power efficiency. Introduction of 1 nm MoO{sub 3} film, which was found to be the optimum layer thickness, resulted in 45% increase in efficiency compared with traditional ITO anode. Results from atomic force microscopy and photoemission spectroscopy showed that smooth surface morphology and suitable energy level alignment of ITO/MoO{sub 3} interface facilitated hole injection and transport. The hole injection and transport mechanism at the ITO/MoO{sub 3} interface in thin and thick buffer layers were analyzed.

  20. Metalorganic vapor phase epitaxy of GaAs on Si using II a-flouride buffer layers

    NASA Astrophysics Data System (ADS)

    Tiwari, A. N.; Freundlich, A.; Beaumont, B.; Blunier, S.; Zogg, H.; Teodoropol, S.; Vèrié, C.

    1992-11-01

    Metalorganic vapor phase epitaxy has been used for the first time to grow epitaxial GaAs layers on (111) and (100) oriented Si either using CaF 2 or stacked (Ca,Sr)F 2/CaF 2 as a buffer. The GaAs layers show sharp and well resolved electron channeling patterns. The Rutherford backscattering (RBS) ion channeling minimum yield is 5% for (111) orientation and 6% for (100) orientation. The GaAs(111) layers are untwinned. The strain in the GaAs layer has been measured with RBS and X-ray diffraction and it is found that the thermal mismatch-induced strain in the GaAs layer is considerably lower than in similar GaAs films grown without flouride buffer.

  1. Crystallinity of YBCO thin films on an MgO substrate using an amorphous buffer layer deposited at a low temperature

    NASA Astrophysics Data System (ADS)

    Nakamura, Y.; Kudo, S.; Mukaida, M.; Ohshima, S.

    2002-10-01

    We have investigated crystallinity of YBCO films on an MgO substrate using an amorphous buffer layer. The evaluated films are obtained as follows: an amorphous YBCO buffer layer is deposited on the MgO substrate at a low temperature (200 °C); and then, an amorphous buffer layer is crystallized by the thermal annealing at a high temperature from 910 to 1030 °C; finally, main YBCO film is grown on the crystalline YBCO buffer layer over the MgO substrate. A significant improvement in the crystalline quality of the YBCO films was achieved, when amorphous buffer layers of 100 nm in thickness were crystallized by annealing temperature 950 °C and then annealing is continued for 1 h in air atmosphere. We confirmed that YBCO films grown on a well-crystallized buffer layer had better crystallinity than ones on bare MgO substrate, which has substantially large lattice mismatch.

  2. Growth kinetics of AlN and GaN films grown by molecular beam epitaxy on R-plane sapphire substrates

    SciTech Connect

    Chandrasekaran, R.; Moustakas, T. D.; Ozcan, A. S.; Ludwig, K. F.; Zhou, L.; Smith, David J.

    2010-08-15

    This paper reports the growth by molecular beam epitaxy of AlN and GaN thin films on R-plane sapphire substrates. Contrary to previous findings that GaN grows with its (1120) A-plane parallel to the (1102) R-plane of sapphire, our results indicate that the crystallographic orientation of the III-nitride films is strongly dependent on the kinetic conditions of growth for the GaN or AlN buffer layers. Thus, group III-rich conditions for growth of either GaN or AlN buffers result in nitride films having (1120) planes parallel to the sapphire surface, and basal-plane stacking faults parallel to the growth direction. The growth of these buffers under N-rich conditions instead leads to nitride films with (1126) planes parallel to the sapphire surface, with inclined c-plane stacking faults that often terminate threading dislocations. Moreover, electron microscope observations indicate that slight miscut ({approx}0.5 deg. ) of the R-plane sapphire substrate almost completely suppresses the formation of twinning defects in the (1126) GaN films.

  3. Control over the morphology of AlN during molecular beam epitaxy with the plasma activation of nitrogen on Si (111) substrates

    SciTech Connect

    Mizerov, A. M. Kladko, P. N.; Nikitina, E. V.; Egorov, A. Yu.

    2015-02-15

    The results of studies of the growth kinetics of AlN layers during molecular beam epitaxy with the plasma activation of nitrogen using Si (111) substrates are presented. The possibility of the growth of individual AlN/Si (111) nanocolumns using growth conditions with enrichment of the surface with metal near the formation mode of Al drops, at a substrate temperature close to maximal, during molecular beam epitaxy with the plasma activation of nitrogen (T{sub s} ≈ 850°C) is shown. The possibility of growing smooth AlN layers on a nanocolumnar AlN/Si (111) buffer with the use of T{sub s} ≈ 750°C and growth conditions providing enrichment with metal is shown.

  4. Characteristics of GaN-based light emitting diodes with different thicknesses of buffer layer grown by HVPE and MOCVD

    NASA Astrophysics Data System (ADS)

    Tian, Pengfei; Edwards, Paul R.; Wallace, Michael J.; Martin, Robert W.; McKendry, Jonathan J. D.; Gu, Erdan; Dawson, Martin D.; Qiu, Zhi-Jun; Jia, Chuanyu; Chen, Zhizhong; Zhang, Guoyi; Zheng, Lirong; Liu, Ran

    2017-02-01

    GaN-based light emitting diodes (LEDs) have been fabricated on sapphire substrates with different thicknesses of GaN buffer layer grown by a combination of hydride vapor phase epitaxy and metalorganic chemical vapor deposition. We analyzed the LED efficiency and modulation characteristics with buffer thicknesses of 12 μm and 30 μm. With the buffer thickness increase, cathodoluminescence hyperspectral imaging shows that the dislocation density in the buffer layer decreases from  ∼1.3  ×  108 cm‑2 to  ∼1.0  ×  108 cm‑2, and Raman spectra suggest that the compressive stress in the quantum wells is partly relaxed, which leads to a large blue shift in the peak emission wavelength of the photoluminescence and electroluminescent spectra. The combined effects of the low dislocation density and stress relaxation lead to improvements in the efficiency of LEDs with the 30 μm GaN buffer, but the electrical-to-optical modulation bandwidth is higher for the LEDs with the 12 μm GaN buffer. A rate equation analysis suggests that defect-related nonradiative recombination can help increase the modulation bandwidth but reduce the LED efficiency at low currents, suggesting that a compromise should be made in the choice of defect density.

  5. Carbon doped GaN buffer layer using propane for high electron mobility transistor applications: Growth and device results

    SciTech Connect

    Li, X.; Nilsson, D.; Danielsson, Ö.; Pedersen, H.; Janzén, E.; Forsberg, U.; Bergsten, J.; Rorsman, N.

    2015-12-28

    The creation of a semi insulating (SI) buffer layer in AlGaN/GaN High Electron Mobility Transistor (HEMT) devices is crucial for preventing a current path beneath the two-dimensional electron gas (2DEG). In this investigation, we evaluate the use of a gaseous carbon gas precursor, propane, for creating a SI GaN buffer layer in a HEMT structure. The carbon doped profile, using propane gas, is a two stepped profile with a high carbon doping (1.5 × 10{sup 18 }cm{sup −3}) epitaxial layer closest to the substrate and a lower doped layer (3 × 10{sup 16 }cm{sup −3}) closest to the 2DEG channel. Secondary Ion Mass Spectrometry measurement shows a uniform incorporation versus depth, and no memory effect from carbon doping can be seen. The high carbon doping (1.5 × 10{sup 18 }cm{sup −3}) does not influence the surface morphology, and a roughness root-mean-square value of 0.43 nm is obtained from Atomic Force Microscopy. High resolution X-ray diffraction measurements show very sharp peaks and no structural degradation can be seen related to the heavy carbon doped layer. HEMTs are fabricated and show an extremely low drain induced barrier lowering value of 0.1 mV/V, demonstrating an excellent buffer isolation. The carbon doped GaN buffer layer using propane gas is compared to samples using carbon from the trimethylgallium molecule, showing equally low leakage currents, demonstrating the capability of growing highly resistive buffer layers using a gaseous carbon source.

  6. Carbon doped GaN buffer layer using propane for high electron mobility transistor applications: Growth and device results

    NASA Astrophysics Data System (ADS)

    Li, X.; Bergsten, J.; Nilsson, D.; Danielsson, Ö.; Pedersen, H.; Rorsman, N.; Janzén, E.; Forsberg, U.

    2015-12-01

    The creation of a semi insulating (SI) buffer layer in AlGaN/GaN High Electron Mobility Transistor (HEMT) devices is crucial for preventing a current path beneath the two-dimensional electron gas (2DEG). In this investigation, we evaluate the use of a gaseous carbon gas precursor, propane, for creating a SI GaN buffer layer in a HEMT structure. The carbon doped profile, using propane gas, is a two stepped profile with a high carbon doping (1.5 × 1018 cm-3) epitaxial layer closest to the substrate and a lower doped layer (3 × 1016 cm-3) closest to the 2DEG channel. Secondary Ion Mass Spectrometry measurement shows a uniform incorporation versus depth, and no memory effect from carbon doping can be seen. The high carbon doping (1.5 × 1018 cm-3) does not influence the surface morphology, and a roughness root-mean-square value of 0.43 nm is obtained from Atomic Force Microscopy. High resolution X-ray diffraction measurements show very sharp peaks and no structural degradation can be seen related to the heavy carbon doped layer. HEMTs are fabricated and show an extremely low drain induced barrier lowering value of 0.1 mV/V, demonstrating an excellent buffer isolation. The carbon doped GaN buffer layer using propane gas is compared to samples using carbon from the trimethylgallium molecule, showing equally low leakage currents, demonstrating the capability of growing highly resistive buffer layers using a gaseous carbon source.

  7. Integrating AlN with GdN Thin Films in an in Situ CVD Process: Influence on the Oxidation and Crystallinity of GdN.

    PubMed

    Cwik, Stefan; Beer, Sebastian M J; Hoffmann, Stefanie; Krasnopolski, Michael; Rogalla, Detlef; Becker, Hans-Werner; Peeters, Daniel; Ney, Andreas; Devi, Anjana

    2017-08-16

    The application potential of rare earth nitride (REN) materials has been limited due to their high sensitivity to air and moisture leading to facile oxidation upon exposure to ambient conditions. For the growth of device quality films, physical vapor deposition methods, such as molecular beam epitaxy, have been established in the past. In this regard, aluminum nitride (AlN) has been employed as a capping layer to protect the functional gadolinium nitride (GdN) from interaction with the atmosphere. In addition, an AlN buffer was employed between a silicon substrate and GdN serving as a seeding layer for epitaxial growth. In pursuit to grow high-quality GdN thin films by chemical vapor deposition (CVD), this successful concept is transferred to an in situ CVD process. Thereby, AlN thin films are included step-wise in the stack starting with Si/GdN/AlN structures to realize long-term stability of the oxophilic GdN layer. As a second strategy, a Si/AlN/GdN/AlN stacked structure was grown, where the additional buffer layer serves as the seeding layer to promote crystalline GdN growth. In addition, chemical interaction between GdN and the Si substrate can be prevented by spatial segregation. The stacked structures grown for the first time with a continuous CVD process were subjected to a detailed investigation in terms of structure, morphology, and composition, revealing an improved GdN purity with respect to earlier grown CVD thin films. Employing thin AlN buffer layers, the crystallinity of the GdN films on Si(100) could additionally be significantly enhanced. Finally, the magnetic properties of the fabricated stacks were evaluated by performing superconducting quantum interference device measurements, both of the as-deposited films and after exposure to ambient conditions, suggesting superparamagnetism of ferromagnetic GdN grains. The consistency of the magnetic properties precludes oxidation of the REN material due to the amorphous AlN capping layer.

  8. Solution-processed MoS(x) as an efficient anode buffer layer in organic solar cells.

    PubMed

    Li, Xiaodong; Zhang, Wenjun; Wu, Yulei; Min, Chao; Fang, Junfeng

    2013-09-25

    We reported a facile solution-processed method to fabricate a MoSx anode buffer layer through thermal decomposition of (NH4)2MoS4. Organic solar cells (OSCs) based on in situ growth MoSx as the anode buffer layer showed impressive improvements, and the power conversion efficiency was higher than that of conventional PEDOT:PSS-based device. The MoSx films obtained at different temperatures and the corresponding device performance were systematically studied. The results indicated that both MoS3 and MoS2 were beneficial to the device performance. MoS3 could result in higher Voc, while MoS2 could lead to higher Jsc. Our results proved that, apart from MoO3, molybdenum sulfides and Mo(4+) were also promising candidates for the anode buffer materials in OSCs.

  9. Epitaxial MgB2 thin films on ZrB2 buffer layers: structural characterization by synchrotron radiation

    NASA Astrophysics Data System (ADS)

    Ferrando, V.; Tarantini, C.; Bellingeri, E.; Manfrinetti, P.; Pallecchi, I.; Marré, D.; Plantevin, O.; Putti, M.; Felici, R.; Ferdeghini, C.

    2004-12-01

    Structural and superconducting properties of magnesium diboride thin films grown by pulsed laser deposition on zirconium diboride buffer layers were studied. We demonstrate that the ZrB2 layer is compatible with the MgB2 two step deposition process. Synchrotron radiation measurements, in particular anomalous diffraction measurements, allowed us to separate MgB2 peaks from ZrB2 ones and revealed that both layers have a single in plane orientation with a sharp interface between them. Moreover, the buffer layer avoids oxygen contamination from the sapphire substrate. The critical temperature of this film is near 37.6 K and the upper critical field measured at the Grenoble High Magnetic Field Laboratory up to 20.3 T is comparable with the highest ones reported in literature.

  10. A Feasibility Study of Applying SS 307Si Buffer Layer for Mitigating the Hot Cracking of Ni-Based Weld Overlay

    NASA Astrophysics Data System (ADS)

    Tsai, Kun-Chao; Jeng, Sheng-Long

    2017-08-01

    The hot cracking behavior of Ni-based Alloy 52M weld overlay with respective SS 307Si and SS 308L buffer layers was investigated. The dilution level of SS 307Si buffer layer is a little higher than that of SS 308L. However, the hot crack length of overlay with SS 307Si buffer layer is shorter and the SS 307Si layer has higher mechanical properties than that of SS 308L layer. As observed by SEM and EBSD, ferrites precipitated in SS 307Si buffer layer are in vermicular skeletons dotted with lathy precipitates, which have a little higher local stain than that of SS 308L weld. However, Alloy 52M weld around SS 307Si fusion boundary has a lower degree of local distortion. The results generalize that the SS 307Si buffer layer is marginally better for reducing hot cracking susceptibility, owing to its lower local stain and slightly higher mechanical strength.

  11. A Feasibility Study of Applying SS 307Si Buffer Layer for Mitigating the Hot Cracking of Ni-Based Weld Overlay

    NASA Astrophysics Data System (ADS)

    Tsai, Kun-Chao; Jeng, Sheng-Long

    2017-07-01

    The hot cracking behavior of Ni-based Alloy 52M weld overlay with respective SS 307Si and SS 308L buffer layers was investigated. The dilution level of SS 307Si buffer layer is a little higher than that of SS 308L. However, the hot crack length of overlay with SS 307Si buffer layer is shorter and the SS 307Si layer has higher mechanical properties than that of SS 308L layer. As observed by SEM and EBSD, ferrites precipitated in SS 307Si buffer layer are in vermicular skeletons dotted with lathy precipitates, which have a little higher local stain than that of SS 308L weld. However, Alloy 52M weld around SS 307Si fusion boundary has a lower degree of local distortion. The results generalize that the SS 307Si buffer layer is marginally better for reducing hot cracking susceptibility, owing to its lower local stain and slightly higher mechanical strength.

  12. Comparison of different photoresist buffer layers in SPR sensors based on D-shaped POF and gold film

    NASA Astrophysics Data System (ADS)

    Cennamo, Nunzio; Pesavento, Maria; De Maria, Letizia; Galatus, Ramona; Mattiello, Francesco; Zeni, Luigi

    2017-04-01

    A comparative analysis of two optical fiber sensing platforms is presented. The sensors are based on surface plasmon resonance (SPR) in a D-shaped plastic optical fiber (POF) with a photoresist buffer layer between the exposed POF core and the thin gold film. We show how the sensor's performances change when the photoresist layer changes. The photoresist layers proposed in this analysis are SU-8 3005 and S1813. The experimental results are congruent with the numerical studies and it is instrumental for chemical and bio-chemical applications. Usually, the photoresist layer is required in order to increase the performance of the SPR-POF sensor.

  13. Threading dislocations in GaAs epitaxial layers on various thickness Ge buffers on 300 mm Si substrates

    NASA Astrophysics Data System (ADS)

    Bogumilowicz, Y.; Hartmann, J. M.; Rochat, N.; Salaun, A.; Martin, M.; Bassani, F.; Baron, T.; David, S.; Bao, X.-Y.; Sanchez, E.

    2016-11-01

    We have grown GaAs epitaxial layers on Ge buffers, themselves on Si (001) substrates, using an Applied Materials 300 mm metal organic chemical vapor deposition tool. We varied the Ge buffer thickness between 0.36 and 1.38 μm and studied the properties of a 0.27 μm thick GaAs layer on top. We found that increasing the Ge buffer thickness yielded smoother GaAs films with an rms surface roughness as low as 0.5 nm obtained on a 5×5 μm2 area. The bow of the substrate increased following a linear law with the epitaxial stack thickness up to 240 μm for a 1.65 μm stack. We have also characterized the threading dislocations present in the GaAs layers using X-ray diffraction and cathodoluminescence. Increasing the Ge buffer thickness resulted in lower threading dislocation densities, enabling us to obtain anti-phase boundary - free GaAs films with a threading dislocation density as low as 3×107 cm-2. In addition, atomic force microscopy surface topology measurements showed the presence of pits in the GaAs layers whose density agreed well with other threading dislocation density assessments. It thus seems that threading dislocations can in certain cases induce some growth rate variations, making them visible in as-grown GaAs films. Using thicker Ge buffers results in smoother films with less threading dislocations, with the side effect of increasing the bow on the wafer. If bow is not an issue, this is a practical approach to improve the GaAs (on Ge buffer) on silicon quality.

  14. Improved performance and stability of organic light-emitting devices with silicon oxy-nitride buffer layer

    NASA Astrophysics Data System (ADS)

    Poon, C. O.; Wong, F. L.; Tong, S. W.; Zhang, R. Q.; Lee, C. S.; Lee, S. T.

    2003-08-01

    The use of silicon oxy-nitride (SiOxNy) as an anode buffer layer in organic light-emitting devices (OLEDs) with a configuration of indium tin oxide (ITO)/SiOxNy/α-naphtylphenyliphenyl diamine (NPB)/8-hydroxyquinoline aluminum/Mg:Ag has been studied. With a SiOxNy buffer layer several angstroms thick, the device efficiency increased from 3.0 to 3.8 cd/A. The buffer layer also protected the ITO surface from contamination due to air exposure. Upon exposing the cleaned ITO substrate to air for one day before device fabrication, the device current efficiency and turn-on voltage degraded to 2.1 cd/A and 4.3 V, respectively, from 3 cd/A and 3.3 V for the device fabricated on an as-cleaned ITO surface. In contrast, devices prepared on air-exposed SiOxNy/ITO surface had almost the same current efficiency (3.85 cd/A) and turn on voltage (3.7 V) comparing to devices (3.8 cd/A and 3.7 V) fabricated on freshly prepared SiOxNy/ITO surface. The results suggested that SiOxNy is a promising anode buffer layer for OLEDs, for both efficiency and stability enhancements.

  15. Efficient quantum dot light-emitting diodes with solution-processable molybdenum oxide as the anode buffer layer.

    PubMed

    He, Shaojian; Li, Shusheng; Wang, Fuzhi; Wang, Andrew Y; Lin, Jun; Tan, Zhan'ao

    2013-05-03

    Quantum dot light-emitting diodes (QD-LEDs) are characterized by pure and saturated emission colors with narrow bandwidth. Optimization of the device interface is an effective way to achieve stable and high-performance QD-LEDs. Here we utilized solution-processed molybdenum oxide (MoOx) as the anode buffer layer on ITO to build efficient QD-LEDs. Using MoOx as the anode buffer layer provides the QD-LED with good Ohmic contact and a small charge transfer resistance. The device luminance is nearly independent of the thickness of the MoOx anode buffer layer. The QD-LEDs with a MoOx anode buffer layer exhibit a maximum luminance and luminous efficiency of 5230 cd m(-2) and 0.67 cd A(-1) for the yellow emission at 580 nm, and 7842 cd m(-2) and 1.49 cd A(-1) for the red emission at 610 nm, respectively.

  16. Light emission from an m-plane n-ZnO/p-Si heterojunction with an AlN interlayer

    NASA Astrophysics Data System (ADS)

    Chen, Chao; Wang, Ti; Xu, Yang; Ai, Zhiwei

    2017-01-01

    Nonpolar m-plane n-ZnO/p-Si heterojunction light-emitting devices with and without an AlN intermediate layer were fabricated by atomic layer deposition. The energy band alignment of the ZnO/AlN/Si heterostructure was studied using X-ray photoelectron spectroscopy, and the result confirmed the electron-blocking ability of the AlN interlayer. Electroluminescence results revealed that the devices with the AlN intermediate layer emit a quasi-white light. This work indicates that the AlN intermediate layer can effectively improve the performance of n-ZnO/p-Si heterojunction light-emitting devices.

  17. Cd-Zn-O-S alloys for optimal buffer layers in thin-film photovoltaics (Presentation Recording)

    NASA Astrophysics Data System (ADS)

    Varley, Joel B.; He, Xiaoqing; Mackie, Neil; Rockett, Angus A.; Lordi, Vincenzo

    2015-09-01

    Advances in thin-film photovoltaics have largely focused on modifying the absorber layer(s), while the choices for other layers in the solar cell stack have remained somewhat limited. In particular, cadmium sulfide (CdS) is widely used as the buffer layer in typical record devices utilizing absorbers like Cu(In,Ga)Se2 (CIGSe) or Cu2ZnSnS4 (CZTS) despite leading to a loss of solar photocurrent due to its band gap of 2.4 eV. While different buffers such as Zn(S,O,OH) are beginning to become competitive with CdS, the identification of additional wider-band gap alternatives with electrical properties comparable to or better than CdS is highly desirable. Here we use hybrid density functional calculations to characterize CdxZn1-xOyS1-y candidate buffer layers in the quaternary phase space composed by Cd, Zn, O, and S. We focus on the band gaps and band offsets of the alloys to assess strategies for improving absorption losses from conventional CdS buffers while maintaining similar conduction band offsets known to facilitate good device performance. We also consider additional criteria such as lattice matching to identify regions in the composition space that may provide improved epitaxy to CIGSe and CZTS absorbers. Lastly, we incorporate our calculated alloy properties into device model simulations of typical CIGSe devices to identify the CdxZn1-xOyS1-y buffer compositions that lead to the best performance. This work performed under the auspices of the U.S. Department of Energy by Lawrence Livermore National Laboratory under Contract DE-AC52-07NA27344 and funded by the Department of Energy office of Energy Efficiency and Renewable Energy (EERE) through the SunShot Bridging Research Interactions through collaborative Development Grants in Energy (BRIDGE) program.

  18. Characterization of MFIS Structure with Dy-Doped ZrO2 Buffer Layer

    NASA Astrophysics Data System (ADS)

    Im, J. H.; Ah, G. Z.; Han, D. H.; Park, B. E.

    2011-12-01

    To evaluate the feasibility of DZO thin film as an insulating buffer layer for ferroelectric gate field effect transistors (Fe-FETs) with a metal-ferroelectric-insulator-semiconductor (MFIS) structure, we fabricated DZO/Si and BLT/DZO/Si structures by a sol-gel method. Equivalent oxide thickness (EOT) values of the DZO thin films were about 12.4nm, 11.9nm, 11.2nm and 11.1 nm for 650 °C, 700 °C 750 °C, and 800 °C,, respectively. Hysteresis was observed in all capacitance-voltage (C-V) curves of the DZO/Si structures, but hysteresis of the 750-°C-annealed film was negligible. The leakage current densities of the DZO thin films on Si showed the good characteristics regardless of the annealing temperature variations. The C-V characteristics of Au/300-nm-thick BLT/750-°C-annealed DZO/Si structure showed clockwise hysteresis loops, and the memory window width increased as the bias voltage increased. The maximum value of the memory window width was about 1.9 V at ±7 V.

  19. Improving the performance of perovskite solar cells with glycerol-doped PEDOT:PSS buffer layer

    NASA Astrophysics Data System (ADS)

    Jian-Feng, Li; Chuang, Zhao; Heng, Zhang; Jun-Feng, Tong; Peng, Zhang; Chun-Yan, Yang; Yang-Jun, Xia; Duo-Wang, Fan

    2016-02-01

    In this paper, we investigate the effects of glycerol doping on transmittance, conductivity and surface morphology of poly(3,4-ethylene dioxythiophene):poly(styrene sulfonate)) (PEDOT:PSS) and its influence on the performance of perovskite solar cells. . The conductivity of PEDOT:PSS is improved obviously by doping glycerol. The maximum of the conductivity is 0.89 S/cm when the doping concentration reaches 6 wt%, which increases about 127 times compared with undoped. The perovskite solar cells are fabricated with a configuration of indium tin oxide (ITO)/PEDOT:PSS/CH3NH3PbI3/PC61BM/Al, where PEDOT:PSS and PC61BM are used as hole and electron transport layers, respectively. The results show an improvement of hole charge transport as well as an increase of short-circuit current density and a reduction of series resistance, owing to the higher conductivity of the doped PEDOT:PSS. Consequently, it improves the whole performance of perovskite solar cell. The power conversion efficiency (PCE) of the device is improved from 8.57% to 11.03% under AM 1.5 G (100 mW/cm2 illumination) after the buffer layer has been modified. Project supported by the National Natural Science Foundation of China (Grant Nos. 61264002, 61166002, 91333206, and 51463011), the Natural Science Foundation of Gansu Province, China (Grant No. 1308RJZA159), the New Century Excellent Talents in University of Ministry of Education of China (Grant No. NCET-13-0840), the Research Project of Graduate Teacher of Gansu Province, China (Grant No. 2014A-0042), and the Postdoctoral Science Foundation from Lanzhou Jiaotong University, China.

  20. Optimization of the Energy Level Alignment between the Photoactive Layer and the Cathode Contact Utilizing Solution-Processed Hafnium Acetylacetonate as Buffer Layer for Efficient Polymer Solar Cells.

    PubMed

    Yu, Lu; Li, Qiuxiang; Shi, Zhenzhen; Liu, Hao; Wang, Yaping; Wang, Fuzhi; Zhang, Bing; Dai, Songyuan; Lin, Jun; Tan, Zhan'ao

    2016-01-13

    The insertion of an appropriate interfacial buffer layer between the photoactive layer and the contact electrodes makes a great impact on the performance of polymer solar cells (PSCs). Ideal interfacial buffer layers could minimize the interfacial traps and the interfacial barriers caused by the incompatibility between the photoactive layer and the electrodes. In this work, we utilized solution-processed hafnium(IV) acetylacetonate (Hf(acac)4) as an effective cathode buffer layer (CBL) in PSCs to optimize the energy level alignment between the photoactive layer and the cathode contact, with the short-circuit current density (Jsc), open-circuit voltage (Voc), and fill factor (FF) all simultaneously improved with Hf(acac)4 CBL, leading to enhanced power conversion efficiencies (PCEs). Ultraviolet photoemission spectroscopy (UPS) and scanning Kelvin probe microscopy (SKPM) were performed to confirm that the interfacial dipoles were formed with the same orientation direction as the built-in potential between the photoactive layer and Hf(acac)4 CBL, benefiting the exciton separation and electron transport/extraction. In addition, the optical characteristics and surface morphology of the Hf(acac)4 CBL were also investigated.

  1. Zn (O,S) buffer layers by atomic layer deposition in Cu (In,Ga)Se2 based thin film solar cells: Band alignment and sulfur gradient

    NASA Astrophysics Data System (ADS)

    Platzer-Björkman, C.; Törndahl, T.; Abou-Ras, D.; Malmström, J.; Kessler, J.; Stolt, L.

    2006-08-01

    Thin film solar cells with the structure sodalimeglass /Mo/Cu(In,Ga)Se2/Zn(O,S)/ZnO/ZnO:Al are studied for varying thickness and sulfur content of the Zn (O,S) buffer layer. These Zn (O,S) layers were deposited by atomic layer deposition (ALD) at 120°C. Devices with no or small concentrations of sulfur in the buffer layer show low open-circuit voltages. This is explained by the cliff, or negative conduction-band offset (CBO), of -0.2eV measured by photoelectron spectroscopy (PES) and optical methods for the Cu (In,Ga)Se2 (CIGS)/ZnO interface. Devices with ZnS buffer layers exhibit very low photocurrent. This is expected from the large positive CBO (spike) of 1.2eV measured for the CIGS /ZnS interface. For devices with Zn (O,S) buffer layers, two different deposition recipes were found to yield devices with efficiencies equal to or above reference devices in which standard CdS buffer layers were used; ultrathin Zn (O,S) layers with S /Zn ratios of 0.8-0.9, and Zn (O,S) layers of around 30nm with average S /Zn ratios of 0.3. The sulfur concentration increases towards the CIGS interface as revealed by transmission electron microscopy and in vacuo PES measurements. The occurrence of this sulfur gradient in ALD-Zn (O,S) is explained by longer incubation time for ZnO growth compared to ZnS growth. For the Zn (O,S) film with high sulfur content, the CBO is large which causes blocking of the photocurrent unless the film is ultrathin. For the Zn (O,S) film with lower sulfur content, a CBO of 0.2eV is obtained which is close to ideal, according to simulations. Efficiencies of up to 16.4% are obtained for devices with this buffer layer.

  2. High quality AlN epilayers grown on nitrided sapphire by metal organic chemical vapor deposition.

    PubMed

    Wang, Jiaming; Xu, Fujun; He, Chenguang; Zhang, Lisheng; Lu, Lin; Wang, Xinqiang; Qin, Zhixin; Shen, Bo

    2017-02-21

    Influence of sapphire pretreatment conditions on crystalline quality of AlN epilayers has been investigated by metal organic chemical vapor deposition (MOCVD). Compared to alumination treatment, it is found that appropriate sapphire nitridation significantly straightens the surface atomic terraces and decreases the X-ray diffraction (0002) full width at half maximum (FWHM) to a minimum of 55 arcsec, indicating a great improvement of the tilting feature of the grain structures in the AlN epilayer. More importantly, there is no inversion domains (IDs) found in the AlN epilayers, which clarifies that optimal sapphire nitridation is promising in the growth of high quality AlN. It is deduced that the different interfacial atomic structures caused by various pretreatment conditions influence the orientation of the AlN nucleation layer grains, which eventually determines the tilting features of the AlN epilayers.

  3. High quality AlN epilayers grown on nitrided sapphire by metal organic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Wang, Jiaming; Xu, Fujun; He, Chenguang; Zhang, Lisheng; Lu, Lin; Wang, Xinqiang; Qin, Zhixin; Shen, Bo

    2017-02-01

    Influence of sapphire pretreatment conditions on crystalline quality of AlN epilayers has been investigated by metal organic chemical vapor deposition (MOCVD). Compared to alumination treatment, it is found that appropriate sapphire nitridation significantly straightens the surface atomic terraces and decreases the X-ray diffraction (0002) full width at half maximum (FWHM) to a minimum of 55 arcsec, indicating a great improvement of the tilting feature of the grain structures in the AlN epilayer. More importantly, there is no inversion domains (IDs) found in the AlN epilayers, which clarifies that optimal sapphire nitridation is promising in the growth of high quality AlN. It is deduced that the different interfacial atomic structures caused by various pretreatment conditions influence the orientation of the AlN nucleation layer grains, which eventually determines the tilting features of the AlN epilayers.

  4. High quality AlN epilayers grown on nitrided sapphire by metal organic chemical vapor deposition

    PubMed Central

    Wang, Jiaming; Xu, Fujun; He, Chenguang; Zhang, Lisheng; Lu, Lin; Wang, Xinqiang; Qin, Zhixin; Shen, Bo

    2017-01-01

    Influence of sapphire pretreatment conditions on crystalline quality of AlN epilayers has been investigated by metal organic chemical vapor deposition (MOCVD). Compared to alumination treatment, it is found that appropriate sapphire nitridation significantly straightens the surface atomic terraces and decreases the X-ray diffraction (0002) full width at half maximum (FWHM) to a minimum of 55 arcsec, indicating a great improvement of the tilting feature of the grain structures in the AlN epilayer. More importantly, there is no inversion domains (IDs) found in the AlN epilayers, which clarifies that optimal sapphire nitridation is promising in the growth of high quality AlN. It is deduced that the different interfacial atomic structures caused by various pretreatment conditions influence the orientation of the AlN nucleation layer grains, which eventually determines the tilting features of the AlN epilayers. PMID:28220829

  5. Simultaneous enhancement of photovoltage and charge transfer in Cu2O-based photocathode using buffer and protective layers

    NASA Astrophysics Data System (ADS)

    Li, Changli; Hisatomi, Takashi; Watanabe, Osamu; Nakabayashi, Mamiko; Shibata, Naoya; Domen, Kazunari; Delaunay, Jean-Jacques

    2016-07-01

    Coating n-type buffer and protective layers on Cu2O may be an effective means to improve the photoelectrochemical (PEC) water-splitting performance of Cu2O-based photocathodes. In this letter, the functions of the buffer layer and protective layer on Cu2O are examined. It is found that a Ga2O3 buffer layer can form a buried junction with Cu2O, which inhibits Cu2O self-reduction as well as increases the photovoltage through a small conduction band offset between the two semiconductors. The introduction of a TiO2 thin protective layer not only improves the stability of the photocathode but also enhances the electron transfer from the photocathode surface into the electrolyte, thus resulting in an increase in photocurrent at positive potentials. These results show that the selection of overlayers with appropriate conduction band positions provides an effective strategy for obtaining a high photovoltage and high photocurrent in PEC systems.

  6. Preferential orientation growth of ITO thin film on quartz substrate with ZnO buffer layer by magnetron sputtering technique

    NASA Astrophysics Data System (ADS)

    Du, Wenhan; Yang, Jingjing; Xiong, Chao; Zhao, Yu; Zhu, Xifang

    2017-07-01

    In order to improve the photoelectric transformation efficiency of thin-film solar cells, one plausible method was to improve the transparent conductive oxides (TCO) material property. In-doped tin oxide (ITO) was an important TCO material which was used as a front contact layer in thin-film solar cell. Using magnetron sputtering deposition technique, we prepared preferential orientation ITO thin films on quartz substrate. XRD and SEM measurements were used to characterize the crystalline structure and morphology of ITO thin films. The key step was adding a ZnO thin film buffer layer before ITO deposition. ZnO thin film buffer layer increases the nucleation center numbers and results in the (222) preferential orientation growth of ITO thin films.

  7. Growth evolution of AlN films on silicon (111) substrates by pulsed laser deposition

    SciTech Connect

    Wang, Haiyan; Wang, Wenliang; Yang, Weijia; Zhou, Shizhong; Lin, Zhiting; Li, Guoqiang

    2015-05-14

    AlN films with various thicknesses have been grown on Si(111) substrates by pulsed laser deposition (PLD). The surface morphology and structural property of the as-grown AlN films have been investigated carefully to comprehensively explore the epitaxial behavior. The ∼2 nm-thick AlN film initially grown on Si substrate exhibits an atomically flat surface with a root-mean-square surface roughness of 0.23 nm. As the thickness increases, AlN grains gradually grow larger, causing a relatively rough surface. The surface morphology of ∼120 nm-thick AlN film indicates that AlN islands coalesce together and eventually form AlN layers. The decreasing growth rate from 240 to 180 nm/h is a direct evidence that the growth mode of AlN films grown on Si substrates by PLD changes from the islands growth to the layer growth. The evolution of AlN films throughout the growth is studied deeply, and its corresponding growth mechanism is hence proposed. These results are instructional for the growth of high-quality nitride films on Si substrates by PLD, and of great interest for the fabrication of AlN-based devices.

  8. Enhancing the blocking temperature of perpendicular-exchange biased Cr2O3 thin films using buffer layers

    NASA Astrophysics Data System (ADS)

    Shimomura, Naoki; Pati, Satya Prakash; Nozaki, Tomohiro; Shibata, Tatsuo; Sahashi, Masashi

    2017-02-01

    In this study, we investigated the effect of buffer layers on the blocking temperature (TB) of perpendicular exchange bias of thin Cr2O3/Co exchange coupled films with a Ru spacer and revealed a high TB of 260 K for 20-nm-thick Cr2O3 thin films. By comparing the TB values of the 20-nm-thick Cr2O3 films on Pt and α-Fe2O3 buffers, we investigated the lattice strain effect on the TB. We show that higher TB values can be obtained using an α-Fe2O3 buffer, which is likely because of the lattice strain-induced increase in Cr2O3 magnetocrystalline anisotropy.

  9. Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer

    NASA Astrophysics Data System (ADS)

    Wong, Man Hoi; Sasaki, Kohei; Kuramata, Akito; Yamakoshi, Shigenobu; Higashiwaki, Masataka

    2016-12-01

    The electron mobility in depletion-mode lateral β-Ga2O3(010) metal-oxide-semiconductor field-effect transistors (MOSFETs) with an n-channel formed by Si-ion (Si+) implantation doping was extracted using low-field electrical measurements on FET structures. An undoped Ga2O3 buffer layer protected the channel against charge compensation by suppressing outdiffusion of deep Fe acceptors from the semi-insulating substrate. The molecular beam epitaxy growth temperature was identified as a key process parameter for eliminating parasitic conduction at the buffer/substrate growth interface. Devices with a resistive buffer showed room temperature channel mobilities of 90-100 cm2 V-1 s-1 at carrier concentrations of low- to mid-1017 cm-3, with small in-plane mobility anisotropy of 10-15% ascribable to anisotropic carrier scattering.

  10. Flexible PTB7:PC71BM bulk heterojunction solar cells with a LiF buffer layer

    NASA Astrophysics Data System (ADS)

    Yanagidate, Tatsuki; Fujii, Shunjiro; Ohzeki, Masaya; Yanagi, Yuichiro; Arai, Yuki; Okukawa, Takanori; Yoshida, Akira; Kataura, Hiromichi; Nishioka, Yasushiro

    2014-02-01

    Bulk heterojunction solar cells were fabricated using poly[4,8-bis[(2-ethylhexyl)oxy]benzo [1,2-b:4,5-b‧]dithiophene-2,6-diyl][3-fluoro-2-[(2-ethylhexyl)carbonyl]thieno[3,4-b]-thiophenediyl] (PTB7) and [6,6]-phenyl C71 butyric acid methyl ester (PC71BM) after a layer of poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) was deposited on a flexible indium tin oxide (ITO)-coated polyethylene terephthalate substrate. The fabricated structures were Al/LiF/PTB7:PC71BM/PEDOT:PSS/ITO with or without a lithium fluoride (LiF) buffer layer, and the effect of the LiF buffer layer on the performance of the solar cells was investigated. The LiF layer significantly increased the open-circuit voltages and fill factors of the solar cells, presumably because of the work function shift of the aluminum cathode. As a result, the conversion efficiency increased from 2.31 to 4.02% owing to the presence of the LiF layer. From the results of a stability test, it was concluded that the inserted LiF layer acted as a shielding and scavenging protector, which prevented the intrusion of some chemical species into the active layer, thereby improving the lifetime of the unpakcaged devices.

  11. Enhanced field emission from ZnO nanowire arrays utilizing MgO buffer between seed layer and silicon substrate

    NASA Astrophysics Data System (ADS)

    Chen, Si; Chen, Jiangtao; Liu, Jianlin; Qi, Jing; Wang, Yuhua

    2016-11-01

    Field emitters based on ZnO nanowires and other nanomaterials are promising high-brightness electron sources for field emission display, microscopy and other applications. The performance of a ZnO nanowire field emitter is linked to the quality, conductivity and alignment of the nanowires on a substrate, therefore requiring ways to improve these parameters. Here, ZnO nanowire arrays were grown on ZnO seed layer on silicon substrate with MgO buffer between the seed layer and Si. The turn-on field and enhancement factor of these nanowire arrays are 3.79 V/μm and 3754, respectively. These properties are improved greatly compared to those of ZnO nanowire arrays grown on ZnO seed layer without MgO buffer, which are 5.06 V/μm and 1697, respectively. The enhanced field emission properties can be attributed to better electron transport in seed layer, and better nanowire alignment because of MgO buffer.

  12. White OLED with high stability and low driving voltage based on a novel buffer layer MoOx

    NASA Astrophysics Data System (ADS)

    Jiang, Xue-Yin; Zhang, Zhi-Lin; Cao, Jin; Khan, M. A.; Khizar-ul-Haq; Zhu, Wen-Qing

    2007-09-01

    White organic light emitting diodes (WOLEDs) with copper phthalocyanine (CuPc), 4,4',4''-tris(N-3-methylphenyl-N-phenyl-amino) triphenylamine (m-MTDATA), tungsten oxide (WO3) and molybdenum oxide (MoOx) as buffer layers have been investigated. The MoOx based device shows superior performance with low driving voltage, high power efficiency and much longer lifetime than those with other buffer layers. For the Cell using MoOx as buffer layer and 4,7-diphenyl-1,10-phenanthroline (Bphen) as electron transporting layer (ETL), at the luminance of 1000 cd m-2, the driving voltage is 4.9 V, which is 4.2 V, 2 V and 0.7 V lower than that of the devices using CuPc (Cell-CuPc), m-MTDATA (Cell-m-MTDATA) and WO3 (Cell-WO3) as buffer layers, respectively. Its power efficiency is 7.67 Lm W-1, which is 2.37 times higher than that of Cell-CuPc and a little higher than that of Cell-m-MTDATA. The projected half-life under the initial luminance of 100 cd m-2 is 55 260 h, which is more than 4.6 times longer than that of Cell-m-MTDATA and Cell-CuPc. The superior performance of Cell-MoOx is attributed to its high hole injection ability and the stable interface between MoOx and organic material. The work function of MoOx has been measured by the contact potential difference method. The J-V curves of 'hole-only' devices indicate that a small hole injection barrier between MoOx/N,'-bis(naphthalene-1-y1)-N, N'-bis(phenyl)-benzidine (NPB) leads to a strong hole injection, resulting in a low driving voltage and a high stability.

  13. Aqueous Chemical Solution Deposition of Novel, Thick and Dense Lattice-Matched Single Buffer Layers Suitable for YBCO Coated Conductors: Preparation and Characterization

    PubMed Central

    Narayanan, Vyshnavi; Van Steenberge, Sigelinde; Lommens, Petra; Van Driessche, Isabel

    2012-01-01

    In this work we present the preparation and characterization of cerium doped lanthanum zirconate (LCZO) films and non-stoichiometric lanthanum zirconate (LZO) buffer layers on metallic Ni-5% W substrates using chemical solution deposition (CSD), starting from aqueous precursor solutions. La2Zr2O7 films doped with varying percentages of Ce at constant La concentration (La0.5CexZr1−xOy) were prepared as well as non-stoichiometric La0.5+xZr0.5−xOy buffer layers with different percentages of La and Zr ratios. The variation in the composition of these thin films enables the creation of novel buffer layers with tailored lattice parameters. This leads to different lattice mismatches with the YBa2Cu3O7−x (YBCO) superconducting layer on top and with the buffer layers or substrate underneath. This possibility of minimized lattice mismatch should allow the use of one single buffer layer instead of the current complicated buffer architectures such as Ni-(5% W)/LZO/LZO/CeO2. Here, single, crack-free LCZO and non-stoichiometric LZO layers with thicknesses of up to 140 nm could be obtained in one single CSD step. The crystallinity and microstructure of these layers were studied by XRD, and SEM and the effective buffer layer action was studied using XPS depth profiling.

  14. Structural and optical properties of AlxGa1-xN (0.33 ≤ x ≤ 0.79) layers on high-temperature AlN interlayer grown by metal organic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Xu, Qingjun; Liu, Bin; Zhang, Shiying; Tao, Tao; Dai, Jiangping; He, Guotang; Xie, Zili; Xiu, Xiangqian; Chen, Dunjun; Chen, Peng; Han, Ping; Zhang, Rong

    2017-01-01

    High-Al-content AlxGa1-xN films with x varying from 0.33 to 0.79 were grown on GaN templates with the high temperature AlN (HT-AlN) interlayer by metal organic chemical vapor deposition (MOCVD). The best crystalline quality, among these AlxGa1-xN alloys, can be obtained for an AlN mole fraction x = 0.55, where the full-width at half-maximum of the Al0.55Ga0.45N (0002) diffraction peak was measured to be 259 arcsec by high resolution X-ray diffraction (HRXRD). The screw threading dislocation (TDs) density was 2 × 108 cm-2 evaluated by transmission electron microscope (TEM), which agreed with the calculations from Williamson-Hall plots. Moreover, cross-sectional TEM indicated that the HT-AlN interlayer could sufficiently reduce the threading dislocations (TDs) through generation of V trenches in the HT-AlN interlayer, since the TDs propagated along the V trenches, then bent into basal planes and annihilated with other dislocations. The study of optical properties indicated that obvious S-shape of temperature dependence on emission energy was observed for Al0.55Ga0.45N layers, which was attributed to exciton localization with energy (Eloc) ∼14.95 meV at 10 K resulting from potential fluctuation and band tail states. The time-resolved photoluminescence (TRPL) curves showed a bi-exponential decay at low temperature. The fast decay time implied the presence of the localized excitons enhancing radiative recombination, while the quite slow one was due to the dominance of trapping mechanisms originating from cation vacancy complexes and the VIII-related complexes.

  15. Probing temperature gradients within the GaN buffer layer of AlGaN/GaN high electron mobility transistors with Raman thermography

    SciTech Connect

    Hodges, C. Pomeroy, J.; Kuball, M.

    2014-02-14

    We demonstrate the ability of confocal Raman thermography using a spatial filter and azimuthal polarization to probe vertical temperature gradients within the GaN buffer layer of operating AlGaN/GaN high electron mobility transistors. Temperature gradients in the GaN layer are measured by using offset focal planes to minimize the contribution from different regions of the GaN buffer. The measured temperature gradient is in good agreement with a thermal simulation treating the GaN thermal conductivity as homogeneous throughout the layer and including a low thermal conductivity nucleation layer to model the heat flow between the buffer and substrate.

  16. Effects of high-temperature AIN buffer on the microstructure of AlGaN/GaN HEMTs

    SciTech Connect

    Coerekci, S.; Oeztuerk, M. K.; Yu, Hongbo; Cakmak, M.; Oezcelik, S.; Oezbay, E.

    2013-06-15

    Effects on AlGaN/GaN high-electron-mobility transistor structure of a high-temperature AlN buffer on sapphire substrate have been studied by high-resolution x-ray diffraction and atomic force microscopy techniques. The buffer improves the microstructural quality of GaN epilayer and reduces approximately one order of magnitude the edge-type threading dislocation density. As expected, the buffer also leads an atomically flat surface with a low root-mean-square of 0.25 nm and a step termination density in the range of 10{sup 8} cm{sup -2}. Due to the high-temperature buffer layer, no change on the strain character of the GaN and AlGaN epitaxial layers has been observed. Both epilayers exhibit compressive strain in parallel to the growth direction and tensile strain in perpendicular to the growth direction. However, an high-temperature AlN buffer layer on sapphire substrate in the HEMT structure reduces the tensile stress in the AlGaN layer.

  17. Thermally robust perpendicular Co/Pd-based synthetic antiferromagnetic coupling enabled by a W capping or buffer layer.

    PubMed

    Lee, Ja-Bin; An, Gwang-Guk; Yang, Seung-Mo; Park, Hae-Soo; Chung, Woo-Seong; Hong, Jin-Pyo

    2016-02-18

    Perpendicularly magnetized tunnel junctions (p-MTJs) that contain synthetic antiferromagnetic (SAF) frames show promise as reliable building blocks to meet the demands of perpendicular magnetic anisotropy (PMA)-based spintronic devices. In particular, Co/Pd multilayer-based SAFs have been widely employed due to their outstanding PMA features. However, the widespread utilization of Co/Pd multilayer SAFs coupled with an adjacent CoFeB reference layer (RL) is still a challenge due to the structural discontinuity or intermixing that occurs during high temperature annealing. Thus, we address the thermally robust characteristics of Co/Pd multilayer SAFs by controlling a W layer as a potential buffer or capping layer. The W-capped Co/Pd multilayer SAF, which acts as a pinning layer, exhibited a wide-range plateau with sharp spin-flip and near-zero remanence at the zero field. Structural analysis of the W-capped multilayer SAF exhibited single-crystal-like c-axis oriented crystalline features after annealing at 400 °C, thereby demonstrating the applicability of these frames. In addition, when the W layer serving as a buffer layer in the Co/Pd multilayer SAF was coupled with a conventional CoFeB RL, higher annealing stability up to 425 °C and prominent antiferromagnetic coupling behavior were obtained.

  18. Thermally robust perpendicular Co/Pd-based synthetic antiferromagnetic coupling enabled by a W capping or buffer layer

    PubMed Central

    Lee, Ja-Bin; An, Gwang-Guk; Yang, Seung-Mo; Park, Hae-Soo; Chung, Woo-Seong; Hong, Jin-Pyo

    2016-01-01

    Perpendicularly magnetized tunnel junctions (p-MTJs) that contain synthetic antiferromagnetic (SAF) frames show promise as reliable building blocks to meet the demands of perpendicular magnetic anisotropy (PMA)-based spintronic devices. In particular, Co/Pd multilayer-based SAFs have been widely employed due to their outstanding PMA features. However, the widespread utilization of Co/Pd multilayer SAFs coupled with an adjacent CoFeB reference layer (RL) is still a challenge due to the structural discontinuity or intermixing that occurs during high temperature annealing. Thus, we address the thermally robust characteristics of Co/Pd multilayer SAFs by controlling a W layer as a potential buffer or capping layer. The W-capped Co/Pd multilayer SAF, which acts as a pinning layer, exhibited a wide-range plateau with sharp spin-flip and near-zero remanence at the zero field. Structural analysis of the W-capped multilayer SAF exhibited single-crystal-like c-axis oriented crystalline features after annealing at 400 °C, thereby demonstrating the applicability of these frames. In addition, when the W layer serving as a buffer layer in the Co/Pd multilayer SAF was coupled with a conventional CoFeB RL, higher annealing stability up to 425 °C and prominent antiferromagnetic coupling behavior were obtained. PMID:26887790

  19. Photovoltaic Properties in Interpenetrating Heterojunction Organic Solar Cells Utilizing MoO₃ and ZnO Charge Transport Buffer Layers.

    PubMed

    Hori, Tetsuro; Moritou, Hiroki; Fukuoka, Naoki; Sakamoto, Junki; Fujii, Akihiko; Ozaki, Masanori

    2010-11-08

    Organic thin-film solar cells with a conducting polymer (CP)/fullerene (C60) interpenetrating heterojunction structure, fabricated by spin-coating a CP onto a C60 deposit thin film, have been investigated and demonstrated to have high efficiency. The photovoltaic properties of solar cells with a structure of indium-tin-oxide/C60/ poly(3-hexylthiophene) (PAT6)/Au have been improved by the insertion of molybdenum trioxide (VI) (MoO₃) and zinc oxide charge transport buffer layers. The enhanced photovoltaic properties have been discussed, taking into consideration the ground-state charge transfer between PAT6 and MoO₃ by measurement of the differential absorption spectra and the suppressed contact resistance at the interface between the organic and buffer layers.

  20. Advanced Architecture for Colloidal PbS Quantum Dot Solar Cells Exploiting a CdSe Quantum Dot Buffer Layer.

    PubMed

    Zhao, Tianshuo; Goodwin, Earl D; Guo, Jiacen; Wang, Han; Diroll, Benjamin T; Murray, Christopher B; Kagan, Cherie R

    2016-09-22

    Advanced architectures are required to further improve the performance of colloidal PbS heterojunction quantum dot solar cells. Here, we introduce a CdI2-treated CdSe quantum dot buffer layer at the junction between ZnO nanoparticles and PbS quantum dots in the solar cells. We exploit the surface- and size-tunable electronic properties of the CdSe quantum dots to optimize its carrier concentration and energy band alignment in the heterojunction. We combine optical, electrical, and analytical measurements to show that the CdSe quantum dot buffer layer suppresses interface recombination and contributes additional photogenerated carriers, increasing the open-circuit voltage and short-circuit current of PbS quantum dot solar cells, leading to a 25% increase in solar power conversion efficiency.

  1. Fabrication of (110)-one-axis-oriented perovskite-type oxide thin films and their application to buffer layer

    NASA Astrophysics Data System (ADS)

    Sato, Tomoya; Ichinose, Daichi; Kimura, Junichi; Inoue, Takaaki; Mimura, Takanori; Funakubo, Hiroshi; Uchiyama, Kiyoshi

    2016-10-01

    BaCe0.9Y0.1O3-δ (BCYO) and SrZr0.8Y0.2O3-δ (SZYO) thin films of perovskite-type oxides were deposited on (111)Pt/TiO x /SiO2/(100)Si substrates. X-ray diffraction patterns showed that the (110)-oriented BCYO and SZYO thin films were grown on (111)Pt/Si substrates directly without using any buffer layers. Thin films of SrRuO3 (SRO), a conductive perovskite-type oxide, were also deposited on those films and highly (110)-oriented SRO thin films were obtained. We believe that this (110)-oriented SRO works as a buffer layer to deposit (110)-oriented perovskite-type ferroelectric oxide thin films as well as a bottom electrode and can modify the ferroelectric properties of the oxide thin films by controlling their crystallographic orientations.

  2. Chemical Bath Deposited Zinc Sulfide Buffer Layers for Copper Indium Gallium Sulfur-selenide Solar Cells and Device Analysis

    SciTech Connect

    Kundu, Sambhu N.; Olsen, Larry C.

    2005-01-03

    Cd free CIGSS thin film solar cell structures with a MgF2/TCO/CGD-ZnS/CIGSS/Mo/SLG structure have been fabricated using chemical bath deposited (CBD)-ZnS buffer layers and high quality CIGSS absorber layers supplied from Shell Solar Industries. The use of CBD-ZnS, which is a higher band gap materials than CdS, improved the quantum efficiency of fabricated cells at lower wavelengths, leading to an increase in short circuit current. The best cell to date yielded an active area (0.43 cm2) efficiency of 13.3%. This paper also presents a discussion of the issues relating to the use of the CBD-ZnS buffer materials for improving device performance.

  3. Investigations into alterntive substrate, absorber, and buffer layer processing for Cu(In,Ga)Se{sub 2}-based solar cells

    SciTech Connect

    Tuttle, J.R.; Berens, T.A.; Keane, J.

    1996-05-01

    High-performance Cu(In,Ga)Se{sub 2}(CIGS)-based solar cells are presently fabricated within a narrow range of processing options. In this contribution, alternative substrate, absorber, and buffer layer processing is considered. Cell performance varies considerably when alternative substrates are employed. These variations are narrowed with the addition of Na via a Na{sub 2}S compound. Sputtered and electrodeposited CIGS precursors and completed absorbers show promise as alternatives to evaporation. A recrystallization process is required to improve their quality. (In,Ga){sub y}Se buffer layers contribute to cell performance above 10. Further improvements in these alternatives will lead to combined cell performance greater than 10% in the near term.

  4. Development of Buffer Layer Technologies for LWIR and VLWIR HgCdTe Integration on Si

    DTIC Science & Technology

    2007-11-02

    the-art HgCdTe films ) can only be achieved on a Si(211)B surface orientation. Since Si-based digital electronics utilizes the (100) orientation...for the large lattice mismatch (and crystallographic orientation change) are urgently needed to overcome these problems. Currently ZnTe/ CdTe ...technologies are based on i) the use of ultrathin, GeSi films as obedient buffers ii) wafer bonding of lattice-matched buffers. Summary of the most

  5. ZnO as a buffer layer for growth of BiFeO{sub 3} thin films

    SciTech Connect

    Wu Jiagang; Wang, John

    2010-08-15

    Multiferroic BiFeO{sub 3} thin film was grown on the ZnO-buffered Pt/TiO{sub 2}/SiO{sub 2}/Si(100) substrate by off-axis radio frequency magnetron sputtering, where the ZnO buffer layer gave rise to a strong (110) texture for the BiFeO{sub 3} thin film. The resulting BiFeO{sub 3}/ZnO thin film exhibits diode-like and resistive hysteresis behavior, in which the resistive hysteresis and rectifying ratio are dependent on the applied voltage and temperature. The resistive switching behavior of the BiFeO{sub 3}/ZnO thin film is shown to relate to the trap-controlled space charge limited conduction and interface-limited Fowler-Nordheim tunneling, while the polarization reversal takes place in the BiFeO{sub 3} layer of the heterostructure. The BiFeO{sub 3}/ZnO thin film is also demonstrated with a higher remanent polarization (2P{sub r{approx}}153.6 {mu}C/cm{sup 2}), a much lower dielectric loss (tan {delta}{approx}0.012), and a better fatigue endurance as compared to those of the BiFeO{sub 3} thin film without a ZnO buffer layer, where the much reduced leakage is largely responsible for the enhanced ferroelectric behavior. The ZnO as a buffer layer for BiFeO{sub 3} significantly changes the dielectric relaxation and conduction mechanisms, when the dielectric relaxation and electrical conduction are governed by the thermal excitation of carriers from the second-ionization and short-range motion of oxygen vacancies, respectively, while the relaxation process remains the same over the entire temperature range of 20 to 200 deg. C investigated in the present study.

  6. Improving fatigue resistance of Pb(Zr,Ti)O3 thin films by using PbZrO3 buffer layers

    NASA Astrophysics Data System (ADS)

    Mensur Alkoy, Ebru; Uchiyama, Kiyoshi; Shiosaki, Tadashi; Alkoy, Sedat

    2006-05-01

    Ferroelectric Pb(Zr0.52Ti0.48)O3 (PZT) thin films with PbZrO3 (PZ) buffer layers were prepared on Pt(111)/Ti/SiO2/Si(100) substrates using a hybrid rf magnetron sputtering and sol-gel process. Texture of PZT films was found to depend on Pb content of PZ buffer layers. Buffered PZT films displayed comparable ferroelectric properties (2Pr=38-53 μC/cm2,2Ec=136-170 kV/cm) with unbuffered PZT. Asymmetric leakage current and fatigue behavior with superior fatigue resistance was observed in PZ buffered PZT compared to unbuffered films. PZ buffer layers were found to affect crystallization and texture of PZT, and act as a capacitive interface layer possibly blocking charge injection from electrodes.

  7. Digitally alloyed modulated precursor flow epitaxial growth of Al xGa 1-xN layers with AlN and Al yGa 1-yN monolayers

    NASA Astrophysics Data System (ADS)

    Choi, Suk; Kim, Hee Jin; Ryou, Jae-Hyun; Dupuis, Russell D.

    2009-06-01

    We propose a new growth scheme of digitally alloyed modulated precursor flow epitaxial growth (DA-MPEG) using metalorganic and hydride precursors for the growth of AlxGa1-xN layers with high-Al content at relatively low temperatures. The growth of high-quality, high-Al content AlxGa1-xN layers (xAl>50%) that are composed of AlN and AlyGa1-yN monolayers on AlN/sapphire template/substrates by DA-MPEG was demonstrated. The overall composition of the ternary AlxGa1-xN material by DA-MPEG can be controlled continuously by adjusting the Column III mole fraction of the atomic AlyGa1-yN sub-layer. X-ray diffraction and optical transmittance results show that the AlGaN materials have good crystalline quality. The surface morphology of DA-MPEG AlGaN samples measured by atomic force microscopy are comparable to high-temperature-grown AlGaN and are free from surface features such as nano-pits.

  8. Epitaxial NbN/AlN/NbN tunnel junctions on Si substrates with TiN buffer layers

    SciTech Connect

    Sun, Rui; Makise, Kazumasa; Terai, Hirotaka; Zhang, Lu; Wang, Zhen

    2016-06-15

    We have developed epitaxial NbN/AlN/NbN tunnel junctions on Si (100) substrates with a TiN buffer layer. A 50-nm-thick (200)-oriented TiN thin film was introduced as the buffer layer for epitaxial growth of NbN/AlN/NbN trilayers on Si substrates. The fabricated NbN/AlN/NbN junctions demonstrated excellent tunneling properties with a high gap voltage of 5.5 mV, a large I{sub c}R{sub N} product of 3.8 mV, a sharp quasiparticle current rise with a ΔV{sub g} of 0.4 mV, and a small subgap leakage current. The junction quality factor R{sub sg}/R{sub N} was about 23 for the junction with a J{sub c} of 47 A/cm{sup 2} and was about 6 for the junction with a J{sub c} of 3.0 kA/cm{sup 2}. X-ray diffraction and transmission electron microscopy observations showed that the NbN/AlN/NbN trilayers were grown epitaxially on the (200)-orientated TiN buffer layer and had a highly crystalline structure with the (200) orientation.

  9. Atomically flat Ge buffer layers and alternating shutter growth of CaGe2 for large area germanane

    NASA Astrophysics Data System (ADS)

    Xu, Jinsong; Katoch, Jyoti; Ahmed, Adam; Pinchuk, Igor; Williams, Robert; McComb, David; Kawakami, Roland

    Germanane (GeH), which is converted from CaGe2 by soaking in HCl acid, has recently attracted interest because of its novel properties, such as large band gap (1.56eV), spin orbit coupling and predictions of high mobility (18000 cm2/Vs). Previously CaGe2 was successfully grown on Ge(111) substrates by molecular beam epitaxy (MBE) growth. But there were cracks between µm-sized islands, which is not desirable for scientific study and application, and limits the material quality. By growing atomically flat Ge buffer layers and using alternating shutter MBE growth, we are able to grow crack-free, large area films of CaGe2 films. Reflection high energy electron diffraction (RHEED) patterns of Ge buffer layer and CaGe2 indicates high quality two dimensional surfaces, which is further confirmed by atomic force microscopy (AFM), showing atomically flat and uniform Ge buffer layer and CaGe2. The appearance of Laue oscillation in X-ray diffraction (XRD) and Kiessig fringes in X-ray reflectivity (XRR) proves the uniformity of CaGe2 film and the smoothness of the interface. The high quality of CaGe2 film makes it promising to explore novel properties of GeH. Funded by NSF MRSEC DMR-1420451.

  10. Growth modes of InN (000-1) on GaN buffer layers on sapphire

    NASA Astrophysics Data System (ADS)

    Liu, Bing; Kitajima, Takeshi; Chen, Dongxue; Leone, Stephen R.

    2005-03-01

    In this work, using atomic force microscopy and scanning tunneling microscopy, we study the surface morphologies of epitaxial InN films grown by plasma-assisted molecular beam epitaxy with intervening GaN buffer layers on sapphire substrates. On smooth GaN buffer layers, nucleation and evolution of three-dimensional InN islands at various coverages and growth temperatures are investigated. The shapes of the InN islands are observed to be predominantly mesalike with large flat (000-1) tops, which suggests a possible role of indium as a surfactant. Rough GaN buffer layers composed of dense small GaN islands are found to significantly improve uniform InN wetting of the substrates, on which atomically smooth InN films are obtained that show the characteristics of step-flow growth. Scanning tunneling microscopy imaging reveals the defect-mediated surface morphology of smooth InN films, including surface terminations of screw dislocations and a high density of shallow surface pits with depths less than 0.3 nm. The mechanisms of the three-dimensional island size and shape evolution and formation of defects on smooth surfaces are considered.

  11. The effects of the porous buffer layer and doping with dysprosium on internal stresses in the GaInP:Dy/por-GaAs/GaAs(100) heterostructures

    SciTech Connect

    Seredin, P. V.; Gordienko, N. N.; Glotov, A. V.; Zhurbina, I. A.; Domashevskaya, E. P.; Arsent'ev, I. N. Shishkov, M. V.

    2009-08-15

    In structures with a porous buffer layer, residual internal stresses caused by a mismatch between the crystal-lattice parameters of the epitaxial GaInP alloy and the GaAs substrate are redistributed to the porous layer that acts as a buffer and is conducive to disappearance of internal stresses. Doping of the epitaxial layer with dysprosium exerts a similar effect on the internal stresses in the film-substrate structure.

  12. Y1Ba2Cu3O(6+delta) growth on thin Y-enhanced SiO2 buffer layers on silicon

    NASA Technical Reports Server (NTRS)

    Robin, T.; Mesarwi, A.; Wu, N. J.; Fan, W. C.; Espoir, L.; Ignatiev, A.; Sega, R.

    1991-01-01

    SiO2 buffer layers as thin as 2 nm have been developed for use in the growth of Y1Ba2Cu3O(6+delta) thin films on silicon substrates. The SiO2 layers are formed through Y enhancement of silicon oxidation, and are highly stoichiometric. Y1Ba2Cu3O(6+delta) film growth on silicon with thin buffer layers has shown c orientation and Tc0 = 78 K.

  13. Y1Ba2Cu3O(6+delta) growth on thin Y-enhanced SiO2 buffer layers on silicon

    NASA Technical Reports Server (NTRS)

    Robin, T.; Mesarwi, A.; Wu, N. J.; Fan, W. C.; Espoir, L.; Ignatiev, A.; Sega, R.

    1991-01-01

    SiO2 buffer layers as thin as 2 nm have been developed for use in the growth of Y1Ba2Cu3O(6+delta) thin films on silicon substrates. The SiO2 layers are formed through Y enhancement of silicon oxidation, and are highly stoichiometric. Y1Ba2Cu3O(6+delta) film growth on silicon with thin buffer layers has shown c orientation and Tc0 = 78 K.

  14. Fabrication and electrochemical properties of insoluble fullerene-diamine adduct thin-films as buffer layer by alternate immersion process

    NASA Astrophysics Data System (ADS)

    Saito, Jo; Akiyama, Tsuyoshi; Suzuki, Atsushi; Oku, Takeo

    2017-01-01

    Insoluble fullerene-diamine adduct thin-films consisting of C60 and 1,2-diaminoethane were easily fabricated on an electrode by an alternate immersion process. Formation of the C60-diamine adduct films were confirmed using transmission absorption spectroscopy and atomic force microscopy. An inverted-type organic solar cells were fabricated by using the C60-diamine adduct film as the electron transport layer. The resultant photoelectric conversation performance of the solar cells suggested that photocurrent is generated via the photoexcitation of polythiophene. The result suggests that the present insoluble fullerene-diamine adduct films worked as buffer layer for organic thin-film solar cells.

  15. Enhanced Efficiency of Polymer Light-Emitting Diodes by Dispersing Dehydrated Nanotube Titanic Acid in the Hole-buffer Layer

    NASA Astrophysics Data System (ADS)

    Qian, L.; Xu, Z.; Teng, F.; Duan, X.-X.; Jin, Z.-S.; Du, Z.-L.; Li, F.-S.; Zheng, M.-J.; Wang, Y.-S.

    2007-06-01

    Efficiency of polymer light-emitting diodes (PLEDs) with poly(2-methoxy-5-(2-ethyl hexyloxy)- p-phenylene vinylene) (MEH-PPV) as an emitting layer was improved if a dehydrated nanotubed titanic acid (DNTA) doped hole-buffer layer polyethylene dioxythiophene (PEDOT) was used. Photoluminescence (PL) and Raman spectra indicated a stronger interaction between DNTA and sulfur atom in thiophene of PEDOT, which suppresses the chemical interaction between vinylene of MEH-PPV and thiophene of PEDOT. The interaction decreases the defect states in an interface region to result in enhancement in device efficiency, even though the hole transporting ability of PEDOT was decreased.

  16. Comparison of arsenide and phosphide based graded buffer layers used in inverted metamorphic solar cells

    NASA Astrophysics Data System (ADS)

    Zakaria, A.; King, Richard R.; Jackson, M.; Goorsky, M. S.

    2012-07-01

    The effect of graded buffer layer (GBL) composition on inverted metamorphic 1.1-eV In0.24Ga0.76As single-junction solar cells, with applications as a subcell in high-efficiency multijunction solar cells, is investigated. In experiment A, AlxInyGa(1-x-y)As was used as a GBL to transition from the GaAs substrate lattice constant to that of the In0.24Ga0.76As cell. In experiment B, In1-xGaxP was employed. Both GBLs were deposited using growth conditions optimized for lattice-matched growth. Reciprocal space maps showed that the InGaAs cell was fully relaxed in both experiments. They also revealed that the AlInGaAs GBL relaxed very quickly after the start of growth (<0.1 μm). The InGaP GBL on the other hand remained partially strained throughout its structure and full relaxation was only achieved after growth of the InGaAs cell. Atomic force microscopy of the surface of the AlInGaAs GBL showed typical cross-hatch morphology with a roughness of 8.9 nm. The surface of the InGaP GBL was much rougher at 18.3 nm with unusual morphology, likely due to 3D island formation due to unrelieved strain. These findings were confirmed by transmission electron microscopy where the InGaAs cell of experiment A was largely free of imperfections with a defect density of 1.1 × 106 cm-2. Experiment B had defects readily seen throughout the GBL and the InGaAs cell above had a defect density of 1.5 × 109 cm-2. The hardness of the AlInGaAs GBL surface was measured to be 7.2 GPa and exhibited an indentation size effect. The hardness of the InGaP GBL surface was 10.2 GPa regardless of the depth of penetration of the indenter. The lack of indentation size effect in InGaP is due to the high density of dislocations already present in the material due to unrelieved strain. Solar cells fabricated from experiment A wafers exhibited excellent band gap-voltage offset Woc = (Eg/q) - Voc of 0.414 V. Cells from experiment B exhibited a poor Woc of 0.686 V, most likely due to the threading dislocations

  17. Enhancement of perpendicular magnetic anisotropy and coercivity in ultrathin Ru/Co/Ru films through the buffer layer engineering

    NASA Astrophysics Data System (ADS)

    Kolesnikov, Alexander G.; Stebliy, Maxim E.; Ognev, Alexey V.; Samardak, Alexander S.; Fedorets, Aleksandr N.; Plotnikov, Vladimir S.; Han, Xiufeng; Chebotkevich, Ludmila A.

    2016-10-01

    We present results on a study of the interplay between microstructure and the magnetic properties of ultrathin Ru/Co/Ru films with perpendicular magnetic anisotropy (PMA). To induce PMA in the Co layer, we experimentally determined thicknesses of the buffer and capping layers of Ru. The maximum value of PMA was observed for the Co thickness of 0.9 nm with the 3 nm thick capping layer. The effective anisotropy field (H eff) and coercive force (H c) of the Co layer are very sensitive to the Ru buffer layer thickness (t b). The values of H eff and H c increase approximately by two and ten times, correspondingly, when t b changes from 6 to 20 nm, owing to an increase in volume fraction of the crystalline phase as a result of the grains’ growth. PMA is found to be mainly enhanced by elastic strains induced by the lattice mismatch on the Ru/Co and Co/Ru interfaces, leading to the deformation of the Co lattice. The surface impact is determined to be less than 10% of the magneto-elastic contribution to the effective anisotropy. Observation of the magnetic domain structure by means of polar Kerr microscopy reveals that out-of-plane magnetization reversal occurs through the nucleation, growth, and annihilation of domains, where the average size drastically rises with the increasing t b.

  18. High rate buffer layer for IBAD MgO coated conductors

    DOEpatents

    Foltyn, Stephen R.; Jia, Quanxi; Arendt, Paul N.

    2007-08-21

    Articles are provided including a base substrate having a layer of an oriented material thereon, and, a layer of hafnium oxide upon the layer of an oriented material. The layer of hafnium oxide can further include a secondary oxide such as cerium oxide, yttrium oxide, lanthanum oxide, scandium oxide, calcium oxide and magnesium oxide. Such articles can further include thin films of high temperature superconductive oxides such as YBCO upon the layer of hafnium oxide or layer of hafnium oxide and secondary oxide.

  19. Effect of anode buffer layer on the efficiency of inverted quantum-dot light-emitting diodes

    NASA Astrophysics Data System (ADS)

    Ram Cho, Ye; Kang, Pil-Gu; Shin, Dong Heon; Kim, Ji-Hoon; Maeng, Min-Jae; Sakong, Jeonghun; Hong, Jong-Am; Park, Yongsup; Suh, Min Chul

    2016-01-01

    The impact of anode buffer layers (ABLs) on the performance of CdSe quantum-dot light-emitting diodes (QLED) with a ZnO nanoparticle (NP) electron-transport layer and 4,4‧-cyclohexylidenebis[N,N-bis(4-methylphenyl)benzenamine] (TAPC) hole-transport layer was studied. Either MoO3 or 1,4,5,8,9,11-hexaazatriphenylene hexacarbonitrile (HAT-CN) was used as the ABL. The QLED with a HAT-CN ABL exhibited better luminance performance, while the ultraviolet photoelectron spectroscopy and hole-only devices indicated that MoO3 was a superior hole injector. These results suggest that the QLED with a MoO3 ABL suffered from a severe charge carrier imbalance. Therefore, electron injection through the ZnO NP layer must be improved to further enhance the QLED performance.

  20. Chemically deposited La2Zr2O7 buffer layers for YBCO-coated conductors: film growth and microstructure

    NASA Astrophysics Data System (ADS)

    Molina, L.; Knoth, K.; Engel, S.; Holzapfel, B.; Eibl, O.

    2006-11-01

    An adequate buffer layer architecture is of great importance for YBa2Cu3O7-δ (YBCO)-coated conductor fabrication. We present a transmission electron microscopy (TEM) analysis of La2Zr2O7 (LZO) buffer layers on biaxially textured Ni-5 at.%W substrates for YBCO-coated conductors prepared by chemical solution deposition (CSD). The LZO thin films were heat-treated at 900 and 1050 °C respectively. Electron diffraction patterns, and bright and dark-field images were used to determine the microstructure, texture and the nanoporosity of the films. By x-ray diffraction the films were found to be [100] oriented and strongly biaxially textured. Although x-ray diffraction suggests an epitaxial growth of LZO on Ni it was shown by TEM that this was not the case. The grain size of the films is between 100 and 300 nm and therefore much smaller than the Ni grain size of 40 µm. Appropriate acquisition conditions for scanning electron microscopy (SEM) and TEM imaging are given to identify the nanogranularity of the films. For the film annealed at 1050 °C high-resolution SEM images clearly show a polycrystalline LZO microstructure and the grain size can readily be determined. Electron diffraction rings are more pronounced than for the film annealed at 900 °C, indicating a higher level of polycrystallinity in the film. SEM images of the film annealed at 900 °C yield no evidence of a polycrystalline microstructure; only single misoriented LZO grains separated by 500 nm are observed. Nanovoids 10-40 nm in size were found in the LZO buffer layers with a high density. The voids had approximately cuboid shape, indicating an anisotropy of the surface energy in LZO. The surface planes of the voids were identified as {111} lattice planes. Despite the nanoporosity, which is a typical feature of CSD-grown buffer layers, the LZO buffer layers act as efficient Ni diffusion barriers. Energy dispersive x-ray microanalysis (EDX) in the transmission electron microscope yielded the composition of

  1. Fabrication of the cube textured NiO buffer layer by line-focused infrared heating for coated conductor application

    NASA Astrophysics Data System (ADS)

    Chung, Jun-Ki; Kim, Won-Jeong; Tak, Jinsung; Kim, Cheol Jin

    2007-10-01

    Epitaxial growth of NiO on the bi-axially textured Ni-3 at.%W (Ni-3W) substrate as seed layer for coated conductor were studied. The bi-axially textured NiO was formed on the Ni-3W tapes using a line-focused infrared heater by oxidizing the surface of the substrate at 800-950 °C for 15-120 s in oxygen atmosphere. The thickness of the NiO layer could be controlled by changing heat-treatment, which was estimated as approximately 200-500 nm in the cross-sectional SEM micrographs of the NiO/Ni template. This thickness is enough to block the diffusion of the Ni in the substrate to the superconducting layer. The samples showed strong texture development of NiO layer. The sample oxidized at 900 °C with the tape transferring speed of 30 mm/h exhibited ω-scan full width at half maximum (FWHM) values for Ni-3W(2 0 0) and NiO(2 0 0) were 3.97°, and 3.67°, and φ-scan FWHM values for Ni-3W(1 1 1) and NiO(1 1 1) were 9.58°, and 8.79°, respectively. Also, the (1 1 1) pole-figure of the NiO buffer layer showed the good symmetry of the four peaks, securing the epitaxial growth of the buffer layers on the NiO layer. Also NiO layer exhibited root-mean-square roughness value of 39 nm by AFM (10 × 10 μm) investigation.

  2. Highly nonlinear chalcogenide hybrid microstructured optical fibers with buffer layer and their potential performance of supercontinuum generation

    NASA Astrophysics Data System (ADS)

    Tong, Hoang Tuan; Nagasaka, Kenshiro; Nguyen Phuoc, Trung Hoa; Suzuki, Takenobu; Ohishi, Yasutake

    2017-02-01

    We report here the design of a new chalcogenide hybrid microstructured optical fiber (HMOF) with a buffer layer around the core and its potential performance of tailoring chromatic dispersion and supercontinuum (SC) generation. The new chalcogenide HMOF has an AsSe2 core. The refractive index difference Δn between the AsSe2 core and cladding material is supposed to be 0.3. The fiber microstructure and the Δn between the core and buffer materials are designed in order to obtain broad anomalous dispersion regimes with near-zero and flattened chromatic dispersion profiles for broadband SC generation. Moreover, the suppression of chromatic dispersion fluctuation caused by fiber transverse geometry variation is investigated. By using the proposed chalcogenide buffer-embed HMOFs, the calculation shows that near-zero and flattened anomalous chromatic dispersion regimes from 4.5 μm can be obtained. When the variation of fiber structure occurs for +/-1, +/-5 and +/-10 %, the chromatic dispersion fluctuation can be greatly suppressed. In addition, the calculation shows that a broad SC spectrum from 2.5 to more than 16.0 μm can be obtained when a 0.9-cmlong section of the new chalcogenide buffer-embed HMOF is pumped at 5.0 μm by a femtosecond laser with 1-kW peak power.

  3. Cd-free CIGS solar cells with buffer layer based on the In2S3 derivatives.

    PubMed

    Kim, Kihwan; Larina, Liudmila; Yun, Jae Ho; Yoon, Kyung Hoon; Kwon, HyukSang; Ahn, Byung Tae

    2013-06-21

    This study guided by device evaluations was conducted to reveal the reasons for the loss of the photo-generated carriers in CIGS cells with the buffer based on In2S3 derivatives. Chemical bath deposited Inx(OOH,S)y films have been employed as a Cd-free buffer layers. When compared to solar cells with CdS buffer layer, the Cu0.9(In0.7,Ga0.3)Se2.1 (Eg = 1.18 eV) cells with the Inx(OOH,S)y buffer exhibited strong voltage-dependent carrier collection and poor spectral response above 500 nm, presumably, due to energy barrier at the junction. In order to improve the charge collection by upward shift of the conduction band minimum of CIGS absorber, Inx(OOH,S)y/Cu0.9(In0.55,Ga0.45)Se2.1 (Eg = 1.30 eV) solar cells were also fabricated and their spectral responses were examined. When compared to the Cu0.9(In0.7,Ga0.3)Se2.1 cells, the improved spectral response and voltage dependent carrier collection were obtained. Nevertheless, considerable loss in charge collection above 500 nm was still observed. The efficiency reached 9.3% while the Cu0.9(In0.7,Ga0.3)Se2.1 cell exhibited only the efficiency of 3.4%. Finally, CIGS (Eg = 1.18 eV) solar cells with n-ZnO/i-ZnO/Inx(OOH,S)y/CdS/CIGS and n-ZnO/i-ZnO/CdS/Inx(OOH,S)y/CIGS configurations were fabricated. The influence of the TCO/buffer interface on the device characteristics was also addressed by means of comparison between the characteristics of two cells employing different interfaces. A 13.0% efficient cell has been achieved from n-ZnO/i-ZnO/CdS/Inx(OOH,S)y/CIGS configuration. The obtained data suggested that the limitation of the device efficiency was mainly related to the i-ZnO/Inx(OOH,S)y interface. The experimental results provide the knowledge base for further optimization of the interface properties to form high-quality p-n junction in the CIGS solar cells employing the CBD In2S3 buffer layer.

  4. Ultraviolet light emitting diodes by ammonia molecular beam epitaxy on metamorphic (20 2 bar 1) AlGaN/GaN buffer layers

    NASA Astrophysics Data System (ADS)

    Young, Erin C.; Yonkee, Benjamin P.; Wu, Feng; Saifaddin, Burhan K.; Cohen, Daniel A.; DenBaars, Steve P.; Nakamura, Shuji; Speck, James S.

    2015-09-01

    In this paper we demonstrate ultraviolet (UV) light emitting diodes (LEDs) grown on metamorphic AlGaN buffers on freestanding GaN (20 2 bar 1) substrates by ammonia assisted molecular beam epitaxy (MBE). Misfit and related threading dislocations were confined to the stress relaxed, compositionally graded buffer layers, and single quantum well devices emitting at 355, 310 and 274 nm were grown on top of the graded buffers. The devices showed excellent structural and electrical (I-V) characteristics.

  5. Preparation of SmBiO3 buffer layer on YSZ substrate by an improved chemical solution deposition route

    NASA Astrophysics Data System (ADS)

    Zhu, Xiaolei; Pu, Minghua; Zhao, Yong

    2016-12-01

    A quick route for chemical solution deposition (CSD) has been developed to prepare SmBiO3 (SBO) layers on yttria stabilized zirconia (YSZ) substrates rapidly by using of solid state decomposition (SSD) technique. The proper conditions for volatilization of lactic acid, which as solvent in precursor coated layer, and SBO growth are 115°C for 30 min and 794°C for 60 min in flowing Ar gas. The coated layers are amorphous structure of mixture oxides and quasi-crystal structure of SBO before and after growth, respectively. The total time by this quick CSD route for organic solvent volatilization, salts decomposed and layer growth is not up to 2 h, which are much less than that needed for traditional CSD of over 10 h. SBO layer is directly epitaxial growth on YSZ substrate without any lattice rotation. SBO layer prepared by this quick route as well as that by traditional route are suitable for the growth of YBCO. The superconducting transition temperature and critical current density of the coated YBCO layer on SBO/YSZ obtained by this quick route are up to 90 K and 1.66 MA/cm2. These results may be the usable reference for continuous preparation of SBO buffer layer on IBAD-YSZ/Ni-based alloy tapes.

  6. Ferroelectric properties of multi-layer LiTaO 3 thin films with Ta IIO 5 buffer

    NASA Astrophysics Data System (ADS)

    Zhang, De-Yin; Peng, Wei-Dong; Li, Jin-Hua; Li, Kun; Huang, Da-Gui

    2007-12-01

    The new sol-gel derived multi-layer LiTaO 3 thin films with Ta IIO 5 buffer layer were prepared on Pt/Ti/SiO2/Si substrate using lithium ethoxide and tantalum ethoxide as starting materials. The sol of Ta IIO 5 was firstly covered on the substrate by spin coating at 6500rpm for 50s and then a rapid annealing at 650°C for 2min to form an about 20nm thick Ta IIO 5 buffer layer. Multi-layer LiTaO 3 thin films were made over Ta IIO 5 buffer by repeated spin coating at 4000rpm for 30s and then a rapid annealing process at 700°C for 3min. The spectrum of XRD show the crystalline orientation of thin film type Ta IIO 5 is different compared to powder type Ta IIO 5. The SEM micrograph of the cross section shows the prepared sample is uniform, smooth and crack-free on the surface and the thickness of LiTaO 3 thin film is 0.341μm. The ferroelectric hysteresis loop and leakage current of the prepared sample have been measured using Al/LiTaO 3/Ta IIO 5/Pt structure electrode by a ferroelectric material analyzer PLC-100. The remanent polarization and coercive field of the prepared sample polarized at 13V were 3.4μC/cm2 and 185kV/cm respectively. The leakage current of the prepared sample was 2.66x10 -7A at 71.43kV/cm .Experimental results show the prepared sample of LiTaO 3 thin film with Ta IIO 5 buffer has good ferroelectric properties. Ta IIO 5 buffer introduction between LiTaO 3 thin film and Pt substrate can effectively decrease the leakage current and improve the properties of uncooled LiTaO 3 infrared device.

  7. Effect of por-SiC buffer layer on the parameters of thin Er2O3 layers on silicon carbide substrates

    NASA Astrophysics Data System (ADS)

    Bacherikov, Yu Yu; Konakova, R. V.; Okhrimenko, O. B.; Berezovska, N. I.; Kapitanchuk, L. M.; Svetlichnyi, A. M.; Svetlichnaya, L. A.

    2015-04-01

    Using optical absorption and Auger spectrometry techniques, we studied the effect of rapid thermal annealing (RTA) on the properties of erbium oxide films deposited onto a porous silicon carbide buffer layer formed on 4H-SiC substrates. An analysis of atomic composition of the films under investigation as a function of RTA duration was performed. It is shown that phase composition of erbium oxide films on silicon carbide substrates with a porous SiC layer can be changed by varying RTA duration.

  8. Photovoltaic properties of Cu2ZnSnS4 cells fabricated using ZnSnO and ZnSnO/CdS buffer layers

    NASA Astrophysics Data System (ADS)

    Tajima, Shin; Umehara, Mitsutaro; Mise, Takahiro

    2016-11-01

    To improve the photovoltaic properties of Cu2ZnSnS4 (CZTS) photovoltaic cells, we investigated the use of novel buffer layer materials. We found that Zn1- x Sn x O y fabricated by atomic layer deposition functioned as an effective buffer layer. The short-circuit current density increased by 10% because of a decrease in the absorption loss in the short-wavelength region. With Zn0.70Sn0.30O y layers, the conversion efficiency was 5.7%. To reduce interface recombination, a thin CdS layer was inserted between the ZnSnO and CZTS layers. The CZTS cells fabricated using ZnSnO/CdS double buffer layers showed a high open-circuit voltage of 0.81 V.

  9. Crack-free thick (∼5 µm) α-Ga2O3 films on sapphire substrates with α-(Al,Ga)2O3 buffer layers

    NASA Astrophysics Data System (ADS)

    Oda, Masaya; Kaneko, Kentaro; Fujita, Shizuo; Hitora, Toshimi

    2016-12-01

    To obtain crack-free thick α-Ga2O3 films on sapphire substrates, effects and behaviors of buffer layers have been investigated. With the growth of an α-Ga2O3 layer, there appeared an unintentionally formed layer in the sample, which was associated with stress accumulation and could be the seed for crack generation. We obtained a thick (∼5 µm) α-Ga2O3 layer on a sapphire substrate with the insertion of α-(Al0.12Ga0.88)2O3/α-(Al0.02Ga0.98)2O3 buffer layers, and for this sample, we did not observe the intermediate layer, suggesting that the buffer layers were effective for eliminating the stress accumulation at the α-Ga2O3/sapphire interface region.

  10. Mechanism of stress control for GaN growth on Si using AlN interlayers

    NASA Astrophysics Data System (ADS)

    Suzuki, Michihiro; Nakamura, Akihiro; Nakano, Yoshiaki; Sugiyama, Masakazu

    2017-04-01

    For the purpose of controlling the wafer bow of GaN-on-Si structure, in situ curvature transient during the growth of a GaN layer on an AlN interlayer was investigated systematically by estimating the compressive strain applied to the GaN layer with the progress of the layer growth. The compressive strain was dependent on the morphology of the GaN surface prior to the growth of the AlN interlayer. It was found that the transition sequence from GaN growth to AlN growth induces roughening of the GaN surface and both high NH3 partial pressure and the short transition time were effective for reducing the roughness of the GaN surface beneath the AlN interlayer. The improved transition sequence increased the compressive strain in GaN by a factor of 2.5. The AlN grown at the same temperature as that of GaN was beneficial in both better surface morphology and the reduction of the transition time between GaN growth and AlN growth. With this high-temperature AlN interlayer, its thickness is another important factor governing the compressive strain in GaN. To get AlN relaxed for applying the compressive strain to GaN, the AlN layer should be thicker but too thick layer after relaxation results in surface roughening, which in turn introduces defects to the overlying GaN layer and reduces the compressive strain by partial lattice relaxation of GaN.

  11. Inversion domains in AlN grown on (0001) sapphire

    SciTech Connect

    Jasinski, J.; Liliental-Weber, Z.; Paduano, Q.S.; Weyburne, D.W.

    2003-08-25

    Al-polarity inversion domains formed during AlN layer growth on (0001) sapphire were identified using transmission electron microscopy (TEM). They resemble columnar inversion domains reported for GaN films grown on (0001) sapphire. However, for AlN, these columns have a V-like shape with boundaries that deviate by 2 {+-} 0.5{sup o} from the c-axis. TEM identification of these defects agrees with the post-growth surface morphology as well as with the microstructure revealed by etching in hot aqueous KOH.

  12. Molecular beam epitaxy growth of SrO buffer layers on graphite and graphene for the integration of complex oxides

    DOE PAGES

    Ahmed, Adam S.; Wen, Hua; Ohta, Taisuke; ...

    2016-04-27

    Here, we report the successful growth of high-quality SrO films on highly-ordered pyrolytic graphite (HOPG) and single-layer graphene by molecular beam epitaxy. The SrO layers have (001) orientation as confirmed by X-ray diffraction (XRD) while atomic force microscopy measurements show continuous pinhole-free films having rms surface roughness of <1.5 Å. Moreover, transport measurements of exfoliated graphene, after SrO deposition, show a strong dependence between the Dirac point and Sr oxidation. As a result, the SrO is leveraged as a buffer layer for more complex oxide integration via the demonstration of (001) oriented SrTiO3 grown atop a SrO/HOPG stack.

  13. Surface electronic structure of ZrB2 buffer layers for GaN growth on Si wafers

    NASA Astrophysics Data System (ADS)

    Yamada-Takamura, Yukiko; Bussolotti, Fabio; Fleurence, Antoine; Bera, Sambhunath; Friedlein, Rainer

    2010-08-01

    The electronic structure of epitaxial, predominantly single-crystalline thin films of zirconium diboride (ZrB2), a lattice-matching, conductive ceramic to GaN, grown on Si(111) was studied using angle-resolved ultraviolet photoelectron spectroscopy. The existence of Zr-derived surface states dispersing along the Γ¯-M¯ direction indicates a metallic character provided by a two-dimensional Zr-layer at the surface. Together with the measured work function, the results demonstrate that the surface electronic properties of such thin ZrB2(0001) buffer layers are comparable to those of the single crystals promising excellent conduction between nitride layers and the substrate in vertical light-emitting diodes on economic substrates.

  14. Molecular beam epitaxy growth of SrO buffer layers on graphite and graphene for the integration of complex oxides

    SciTech Connect

    Ahmed, Adam S.; Wen, Hua; Ohta, Taisuke; Pinchuk, Igor V.; Zhu, Tiancong; Beechem, Thomas; Kawakami, Roland K.

    2016-04-27

    Here, we report the successful growth of high-quality SrO films on highly-ordered pyrolytic graphite (HOPG) and single-layer graphene by molecular beam epitaxy. The SrO layers have (001) orientation as confirmed by X-ray diffraction (XRD) while atomic force microscopy measurements show continuous pinhole-free films having rms surface roughness of <1.5 Å. Moreover, transport measurements of exfoliated graphene, after SrO deposition, show a strong dependence between the Dirac point and Sr oxidation. As a result, the SrO is leveraged as a buffer layer for more complex oxide integration via the demonstration of (001) oriented SrTiO3 grown atop a SrO/HOPG stack.

  15. Molecular beam epitaxy growth of SrO buffer layers on graphite and graphene for the integration of complex oxides

    NASA Astrophysics Data System (ADS)

    Ahmed, Adam S.; Wen, Hua; Ohta, Taisuke; Pinchuk, Igor V.; Zhu, Tiancong; Beechem, Thomas; Kawakami, Roland K.

    2016-08-01

    We report the successful growth of high-quality SrO films on highly-ordered pyrolytic graphite (HOPG) and single-layer graphene by molecular beam epitaxy. The SrO layers have (001) orientation as confirmed by X-ray diffraction (XRD) while atomic force microscopy measurements show continuous pinhole-free films having rms surface roughness of <1.5 Å. Transport measurements of exfoliated graphene after SrO deposition show a strong dependence between the Dirac point and Sr oxidation. Subsequently, the SrO is leveraged as a buffer layer for more complex oxide integration via the demonstration of (001) oriented SrTiO3 grown atop a SrO/HOPG stack.

  16. The effect of employing the p/i buffer layers and in-situ hydrogen treatment for transparent a-Si:H solar cells.

    PubMed

    Lee, Da Jung; Yun, Sun Jin; Park, Min A; Lim, Jung Wook

    2014-05-01

    In this study, we describe the effects of various thicknesses of triple p/i buffer layers and hydrogen treatment on various performances in the fabrication of transparent a-Si:H solar cells. For the increment of buffer layer thickness, V(oc) increases steadily and J(sc) firstly increases and then decreases. The triple buffer layers also enhance the transmittance as well as conversion efficiency. For hydrogen plasma treatment, overall performances were enhanced with plasma power due to the passivation of dangling bonds at p/i interface. Therefore, the usage of triple buffer layers with proper treatment is beneficial to obtaining transparent a-Si:H solar cells with high quality.

  17. Cube textured CeO2, BaZrO3 and LaAlO3 buffer layers on Ni based Substrates

    NASA Astrophysics Data System (ADS)

    Deinhofer, C.; Gritzner, G.

    2006-06-01

    CeO2, BaZrO3 as well as LaAlO3 buffer layers were deposited on {100}<001> Ni + 5 weight-% W substrates by a wet chemical technique. The solutions were prepared by dissolving the metal nitrates or acetates and zirconiumacetylacetonate, respectively, in mixtures of acetic acid, methanol and water. The solutions were applied by dip- or spincoating, dried at 135 °C and annealed at temperatures between 900 and 1 400 °C depending on the buffer layer for 15 min. under Ar-5% H2 gas flow. Pole-figure measurements proved the exact texture of each buffer layer. Electron microscopy showed dense and smooth buffer layers.

  18. Microstructures of GaN Buffer Layers Grown on Si(111) Using Rapic Thermal Process Low-Pressure Metalorganic Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Peng, Chen; Bo, Shen; Jian-Min, Zhu; Zhi-Zhong, Chen; Yu-Gang, Zhou; Shi-Yong, Xie; Rong, Zhang; Ping, Han; Shu-Lin, Gu; You-Dou, Zheng; Shu-Sheng, Jiang; Duan, Feng; Z, Huang C.

    2000-03-01

    Microstructures of GaN buffer layers grown on Si (111) substrates using rapid thermal process low-pressure metalorganic chemical vapor deposition are investigated by an atomic force microscope (AFM) and a high-resolution transmission electron microscope (HRTEM). AFM images show that the islands appear in the GaN buffer layer after annealing at high temperature. Cross-sectional HRTEM micrographs of the buffer region of these samples indicate that there are bunched steps on the surface of the Si substrate and a lot of domains in GaN misorienting each other with small angles. The boundaries of those domains locate near the bunched steps, and the regions of the film on a terrace between steps have the same crystal orientation. An amorphous-like layer, about 3 nm thick, can also be observed between the GaN buffer layer and the Si substrate.

  19. TEM study of dislocations structure in In0.82Ga0.18As/InP heterostructure with InGaAs as buffer layer

    NASA Astrophysics Data System (ADS)

    Zhao, Liang; Guo, Zuo-xing; Yuan, De-zeng; Wei, Qiu-lin; Zhao, Lei

    2016-05-01

    In order to improve the quality of detector, In x Ga1- x As ( x=0.82) buffer layer has been introduced in In0.82Ga0.18As/InP heterostructure. Dislocation behavior of the multilayer is analyzed through plane and cross section [110] by transmission electron microscopy (TEM) and high resolution transmission electron microscopy (HRTEM). The dislocations are effectively suppressed in In x Ga1- x As ( x=0.82) buffer layer, and the density of dislocations in epilayer is reduced obviously. No lattice mismatch between buffer layer and epilayer results in no misfit dislocation (MD). The threading dislocations (TDs) are directly related to the multiplication of the MDs in buffer layer.

  20. High stability and low driving voltage green organic light emitting diode with molybdenum oxide as buffer layer

    NASA Astrophysics Data System (ADS)

    Jiang, Xue-Yin; Zhang, Zhi-Lin; Cao, Jin; Zhu, Wen-Qing

    2008-06-01

    Green organic light emitting diodes (OLEDs) with copper phthalocyanine (CuPc), 4,4‧,4″-tris[3-methylphenyl(phenyl)amino]triphenymine (m-MTDATA) and molybdenum oxide (MoOx) as buffer layers have been investigated. The MoOx based device shows superior performance with low driving voltage, high power efficiency and much longer lifetime than those with other buffer layers. At the luminance of 100 cd/m2, the driving voltage is 3.8 V, which is 0.5 V and 2.2 V lower than that of the devices using CuPc (Cell-CuPc) and m-MTDATA (Cell-m-MTDATA) as buffer layer, respectively. Its power efficiency is 13.6 Lm/W, which is 38% and 30% higher than that of Cell-CuPc and Cell-m-MTDATA, respectively. The projected half-life under the initial luminance of 100 cd/m2 is 42,400 h, which is more than 3.8 times longer than that of Cell-m-MTDATA and 24 times that of Cell-CuPc. The superior performance of Cell-MoOx is attributed to its high hole injection ability and the stable interface between MoOx and organic material. The work function of MoOx measured by contact potential difference method and the J-V curves of "hole-only" devices indicate that a small barrier between MoOx/N,N‧-di(naphthalene-1-y1)-N,N‧-dipheyl-benzidine (NPB) leads to a strong hole injection, resulting in the low driving voltage and the high stability.

  1. Chitosan-assisted buffer layer incorporated with hydroxypropyl methylcellulose-coated silver nanowires for paper-based sensors

    NASA Astrophysics Data System (ADS)

    Xu, Duohua; Qiu, Jingshen; Wang, Yucheng; Yan, Jiajun; Liu, Gui-Shi; Yang, Bo-Ru

    2017-06-01

    Fabricating flexible sensors on paper is intriguing. Here, we exploited chitosan as a buffer layer to facilitate the fabrication of silver nanowire (AgNW) networks and flexible devices on commercial paper. We found that the AgNW networks exhibited uniform distribution, smooth surface, and strong adhesion. The enhanced adhesion of AgNWs was attributed to the intermolecular hydrogen bonding between chitosan and hydroxypropyl methylcellulose (HPMC), which can be tailored by tuning the pH of the chitosan aqueous solution. This facile fabrication method utilizing biodegradable polymers and cost-effective AgNW ink holds great promise for portable, wearable, and disposable paper-based electronics.

  2. Nanometer-Scale Epitaxial Strain Release in Perovskite Heterostructures Using 'SrAlOx' Sliding Buffer Layers

    SciTech Connect

    Bell, Christopher

    2011-08-11

    We demonstrate the strain release of LaAlO{sub 3} epitaxial film on SrTiO{sub 3} (001) by inserting ultra-thin 'SrAlO{sub x}' buffer layers. Although SrAlO{sub x} is not a perovskite, nor stable as a single phase in bulk, epitaxy stabilizes the perovskite structure up to a thickness of 2 unit cells (uc). At a critical thickness of 3 uc of SrAlO{sub x}, the interlayer acts as a sliding buffer layer, and abruptly relieves the lattice mismatch between the LaAlO{sub 3} filmand the SrTiO{sub 3} substrate, while maintaining crystallinity. This technique may provide a general approach for strain relaxation of perovskite film far below the thermodynamic critical thickness. A central issue in heteroepitaxial filmgrowth is the inevitable difference in lattice constants between the filmand substrate. Due to this lattice mismatch, thin film are subjected to microstructural strain, which can have a significan effect on the filmproperties. This challenge is especially prominent in the rapidly developing fiel of oxide electronics, where much interest is focused on incorporating the emergent physical properties of oxides in devices. Although strain can be used to great effect to engineer unusual ground states, it is often deleterious for bulk first-orde phase transitions, which are suppressed by the strain and symmetry constraints of the substrate. While there are some reports discussing the control of the lattice mismatch in oxides using thick buffer layers, the materials choice, lattice-tunable range, and control of misfit dislocations are still limited. In this Letter, we report the fabrication of strain-relaxed LaAlO{sub 3} (LAO) thin film on SrTiO{sub 3} (STO) (001) using very thin 'SrAlO{sub x}' (SAO) buffer layers. Whereas for 1 or 2 pseudo-perovskite unit cells (uc) of SAO, the subsequent LAO filmis strained to the substrate, at a critical thickness of 3 uc the SAO interlayer abruptly relieves the lattice mismatch between the LAO and the STO, although maintaining the

  3. Superconducting, surface and interface properties of Ho(123) and Bi(2212) films on sapphire with cerium oxide buffer layers

    NASA Astrophysics Data System (ADS)

    Castro, L. F.; Suryanarayanan, R.; Das, A.; Bacca, E.; Gómez, M. E.; Lopera, W.; Prieto, P.; Kreisler, A.; Martin, J. C.

    1995-09-01

    We report on the X-ray diffraction, secondary ion mass spectrometry, and atomic force microscopy on Ho(123) and Bi(2212) films dc sputtered in pure oxygen atmosphere onto heated sapphire substrates with CeO 2 buffer layers. The films were c-axis oriented. The Ho(123) films had a T c of 88 K but had a relatively high room temperature resistivity of 400 μΩcm. The Bi(2212) films showed a broad transition and a low T c of 46 K. The data may be explained by a certain amount of Al diffusion and inhomogenous grain growth.

  4. Improved properties of barium strontium titanate thin films grown on copper foils by pulsed laser deposition using a self-buffered layer.

    SciTech Connect

    Liu, S.; Ma, B.; Narayanan, M.; Balachandran, U.

    2012-01-01

    Ba{sub 0.6}Sr{sub 0.4}TiO{sub 3} (BST) films were deposited by pulsed laser deposition on copper foils with low-temperature self-buffered layers. The deposition conditions included a low oxygen partial pressure and a temperature of 700 C to crystallize the films without the formation of secondary phases and substrate oxidation. The results from x-ray diffraction and scanning electron microscopy indicated that the microstructure of the BST films strongly depended on the growth temperature. The use of the self-buffered layer improved the dielectric properties of the deposited BST films. The leakage current density of the BST films on the copper foil was 4.4 x 10{sup -9} A cm{sup -2} and 3.3 x 10{sup -6} A cm{sup -2} with and without the self-buffered layer, respectively. The ferroelectric hysteresis loop for the BST thin film with buffer layer was slim, in contrast to the distorted loop observed for the film without the buffer layer. The permittivity (7 0 0) and dielectric loss tangent (0.013) of the BST film on the copper foil with self-buffered layer at room temperature were comparable to those of the film on metal and single-crystal substrates.

  5. Epitaxial growth of BaHfO3 buffer layer and its structure degeneration analysed by Raman spectrum.

    PubMed

    Zheng, Jiahui; Fan, Feng; Yan, Xiangfa; Lu, Yuming; Liang, Yu; Bai, Chuanyi; Liu, Zhiyong; Guo, Yanqun; Cai, Chuanbing

    2016-01-01

    BaHfO3 (BHO) has been proposed as a new cap layer material for YBa2Cu3O7-δ (YBCO) coated conductors. Highly c-axis oriented BHO cap layer has been deposited on ion-beam assisted deposition-MgO buffered Hastelloy tapes by direct-current-magnetron sputtering method. The epi-growth of BHO films combined with its properties is investigated in details. The degenerated cubic crystal structure of BHO film is confirmed by Raman spectrum analysis. XRD θ-2θ scan, φ-scan and ω-scan reveal an excellent c-axis alignment with good in-plane and out-of-plane textures for BHO cap layers. SEM and AFM investigations show BHO cap layer a dense and crack-free morphology. Subsequently pure c-axis orientation YBCO film was epitaxial grown on such BHO cap layer successfully, shown BaHfO3 a potential cap layer material for coated conductors.

  6. The role of hydrogenated amorphous silicon oxide buffer layer on improving the performance of hydrogenated amorphous silicon germanium single-junction solar cells

    NASA Astrophysics Data System (ADS)

    Sritharathikhun, Jaran; Inthisang, Sorapong; Krajangsang, Taweewat; Krudtad, Patipan; Jaroensathainchok, Suttinan; Hongsingtong, Aswin; Limmanee, Amornrat; Sriprapha, Kobsak

    2016-12-01

    Hydrogenated amorphous silicon oxide (a-Si1-xOx:H) film was used as a buffer layer at the p-layer (μc-Si1-xOx:H)/i-layer (a-Si1-xGex:H) interface for a narrow band gap hydrogenated amorphous silicon germanium (a-Si1-xGex:H) single-junction solar cell. The a-Si1-xOx:H film was deposited by plasma enhanced chemical vapor deposition (PECVD) at 40 MHz in a same processing chamber as depositing the p-type layer. An optimization of the thickness of the a-Si1-xOx:H buffer layer and the CO2/SiH4 ratio was performed in the fabrication of the a-Si1-xGex:H single junction solar cells. By using the wide band gap a-Si1-xOx:H buffer layer with optimum thickness and CO2/SiH4 ratio, the solar cells showed an improvement in the open-circuit voltage (Voc), fill factor (FF), and short circuit current density (Jsc), compared with the solar cells fabricated using the conventional a-Si:H buffer layer. The experimental results indicated the excellent potential of the wide-gap a-Si1-xOx:H buffer layers for narrow band gap a-Si1-xGex:H single junction solar cells.

  7. The effect of h-BN buffer layers in bilayer graphene on Co (111)

    NASA Astrophysics Data System (ADS)

    Li, Can; Liu, Yan; Zhang, Bin; Wang, Tao; Guo, Qing; Sheng, Kuang; Yin, You

    2015-05-01

    Understanding of the interface of Co/graphene is essential for applications of graphene-based devices, as well as in the process of graphene synthesis. In this paper, the Co/graphene interface, including five structures of bilayer graphene (BLG) on Co (111) surface with bilayer or monolayer BN buffer sheets, is investigated by using density functional theory calculations. The corresponding atomic and electronic structures and Mulliken charge populations are also analyzed. The bilayer BN sheets are found to be the thinnest insulator for the backside Co metal gate, which shields BLG from Co substrate pining, decreases the charges influenced by the substrate, and improves BLG transport mobility.

  8. Distortions to current-voltage curves of cigs cells with sputtered Zinc(Oxygen,Sulfur) buffer layers

    NASA Astrophysics Data System (ADS)

    Song, Tao

    Sputtered-deposited Zn(O,S) is an attractive alternative to CdS for Cu(In,Ga)Se 2 (CIGS) thin-film solar cells' buffer layer. It has a higher band gap and thus allows greater blue photon collection to achieve higher photon current. The primary goal of the thesis is to investigate the effects of the secondary barrier at the buffer-absorber interface on the distortions to current-voltage (J-V) curves of sputtered-Zn(O,S)/CIGS solar cells. A straightforward photodiode model is employed in the numerical simulation to explain the physical mechanisms of the experimental J-V distortions including J-V crossover and red kink. It is shown that the secondary barrier is influenced by both the internal material properties, such as the conduction-band offset (CBO) and the doping density of Zn(O,S), and the external conditions, such as the light intensity and operating temperature. A key parameter for the sputter deposition of Zn(O,S) has been the oxygen fraction in the argon beam. It is found that the CBO varies with the oxygen fraction in the argon beam at a fixed temperature. With a greater CBO (DeltaEC>0.3 eV), the resulting energy barrier limits the electron current flowing across the interface and thus leads to the J-V distortion. Two different ZnS targets, non-indium and indium-doped one, were used to deposit the Zn(O,S) buffer layer. At the same oxygen fraction in argon beam, a non-In-doped Zn(O,S) buffer with a smaller amount of doping forms a greater secondary barrier to limit the electron current due to the compensation of the Zn(O,S) buffer layer. In addition, the temperature-dependent J-V crossover can be explained by the temperature-dependent impact of the secondary barrier - at lower temperature in the dark, the maximum distortion-free barrier is reduced and results in a more serious current limitation, indicating a greater J-V crossover. It is also found that, under low-intensity illumination, there is a lower doping density of Zn(O,S) due to a smaller amount of

  9. Development of mid-frequency AC reactive magnetron sputtering for fast deposition of Y2O3 buffer layers

    NASA Astrophysics Data System (ADS)

    Xiong, Jie; Xia, Yudong; Xue, Yan; Zhang, Fei; Guo, Pei; Zhao, Xiaohui; Tao, Bowan

    2014-02-01

    A reel-to-reel magnetron sputtering system with mid-frequency alternating current (AC) power supply was used to deposit double-sided Y2O3 seed layer on biaxially textured Ni-5 at.%W tape for YBa2Cu3O7-δ coated conductors. A reactive sputtering process was carried out using two opposite symmetrical sputtering guns with metallic yttrium targets and water vapor for oxidizing the sputtered metallic atoms. The voltage control mode of the power supply was used and the influence of the cathode voltage and ArH2 pressure were systematically investigated. Subsequently yttrium-stabilized zirconia (YSZ) barrier and CeO2 cap layers were deposited on the Y2O3 buffered substrates in sequence, indicating high quality and uniform double-sided structure and surface morphology of such the architecture.

  10. Study of the effects of GaN buffer layer quality on the dc characteristics of AlGaN/GaN high electron mobility transistors

    DOE PAGES

    Ahn, Shihyun; Zhu, Weidi; Dong, Chen; ...

    2015-04-21

    Here we studied the effect of buffer layer quality on dc characteristics of AlGaN/GaN high electron mobility (HEMTs). AlGaN/GaN HEMT structures with 2 and 5 μm GaN buffer layers on sapphire substrates from two different vendors with the same Al concentration of AlGaN were used. The defect densities of HEMT structures with 2 and 5 μm GaN buffer layer were 7 × 109 and 5 × 108 cm₋2, respectively, as measured by transmission electron microscopy. There was little difference in drain saturation current or in transfer characteristics in HEMTs on these two types of buffer. However, there was no dispersionmore » observed on the nonpassivated HEMTs with 5 μm GaN buffer layer for gate-lag pulsed measurement at 100 kHz, which was in sharp contrast to the 71% drain current reduction for the HEMT with 2 μm GaN buffer layer.« less

  11. Study of the effects of GaN buffer layer quality on the dc characteristics of AlGaN/GaN high electron mobility transistors

    SciTech Connect

    Ahn, Shihyun; Zhu, Weidi; Dong, Chen; Le, Lingcong; Hwang, Ya-Hsi; Kim, Byung-Jae; Ren, Fan; Pearton, Stephen J.; Lind, Aaron G.; Jones, Kevin S.; Kravchenko, I. I.; Zhang, Ming-Lan

    2015-04-21

    Here we studied the effect of buffer layer quality on dc characteristics of AlGaN/GaN high electron mobility (HEMTs). AlGaN/GaN HEMT structures with 2 and 5 μm GaN buffer layers on sapphire substrates from two different vendors with the same Al concentration of AlGaN were used. The defect densities of HEMT structures with 2 and 5 μm GaN buffer layer were 7 × 109 and 5 × 108 cm₋2, respectively, as measured by transmission electron microscopy. There was little difference in drain saturation current or in transfer characteristics in HEMTs on these two types of buffer. However, there was no dispersion observed on the nonpassivated HEMTs with 5 μm GaN buffer layer for gate-lag pulsed measurement at 100 kHz, which was in sharp contrast to the 71% drain current reduction for the HEMT with 2 μm GaN buffer layer.

  12. A single oxide buffer layer on a cube-textured Ni substrate for the development of YBCO coated conductors by photo-assisted MOCVD

    NASA Astrophysics Data System (ADS)

    Zeng, Jianming; Ignatiev, Alex; Zhou, Yuxiang; Salama, Kamel

    2006-08-01

    Large-scale commercial applications of high-temperature superconducting (HTS) YBa2Cu3O7-x (YBCO)-based second generation coated conductors require simple and cost-effective process technologies to fabricate the buffer layer(s) and YBCO superconducting layer. Sm0.2Ce0.8O2+x (SCO) thick films have been epitaxially deposited on roll-textured Ni substrates as the single buffer layer for HTS coated conductors by using high-rate photo-assisted metal-organic chemical vapour deposition (PhAMOCVD) at a relatively low deposition temperature of 600 °C. YBCO superconducting films were then successfully deposited on these thick SCO single buffer layers by the same high-rate PhAMOCVD process, and yielded critical current densities (Jc) of ~0.52 MA cm-2 at 77 K and zero applied field. X-ray diffraction and scanning electron microscope analyses of SCO/Ni samples revealed very good crystalline structure and surface morphology for the SCO single buffer layers. These results suggest that SCO single buffer layer, as well as the YBCO conductors, fabricated by the high-rate PhAMOCVD technique may offer great potential for manufacturing YBCO coated conductors.

  13. Development of in-situ control diagnostics for application of epitaxial superconductor and buffer layers

    SciTech Connect

    B.C. Winkleman; T.V. Giel; Jason Cunningham

    1999-07-30

    The recent achievements of critical currents in excess of 1 x 10{sup 6} amp/cm{sup 2} at 77 K in YBCO deposited over suitably textured buffer/substrate composites have stimulated interest in the potential fabrication of these coated conductors as wire. Numerous approaches and manufacturing schemes for producing coated conductor wire are currently being developed. Recently, under the US DOE's sponsorship, the University of Tennessee Space Institute performed an extensive evaluation of leading coated conductor processing options. In general, it is their feeling that the science and chemistry that are being developed in the coated conductor wire program now need proper engineering evaluation to define the most viable options for a commercial fabrication process. All fabrication processes will need process control measurements. This report provides a specific review of the needs and available technologies for process control for many of the coated conductor processing options. This report also addresses generic process monitoring areas in which additional research and development is needed. The concentration is on the two different approaches for obtaining the textured substrates that have been identified as viable candidates. These are the Los Alamos National Laboratory's ion-beam assisted deposition, called IBAD, to obtain a highly textured yttria-stabilized zirconia (YSZ) buffer on nickel alloy strips, and Oak Ridge National Laboratory's rolling assisted, bi-axially textured substrate option called RABiTS{trademark}.

  14. DEVELOPMENT OF IN-SITU CONTROL DIAGNOSTICS FOR APPLICATION OF EPITAXIAL SUPERCONDUCTOR AND BUFFER LAYERS

    SciTech Connect

    B.C. Winkleman; T.V. Giel, Jr.; J. Cunningham

    1999-06-30

    The recent achievements of critical currents in excess of 1x10{sup 6}amp/cm{sup 2} at 77K in YBCO deposited over suitably textured buffer/substrate composites have stimulated interest in the potential fabrication of these coated conductors as wire. Numerous approaches and manufacturing schemes for producing coated conductor wire are currently being developed. Recently, under the U. S. Department of Energy (DOE's) sponsorship, the University of Tennessee Space Institute (UTSI) performed an extensive evaluation of leading coated conductor processing options. In general, it is our feeling that the science and chemistry that are being developed in the coated conductor wire program now need proper engineering evaluation to define the most viable options for a commercial fabrication process. All fabrication processes will need process control measurements. This report provides a specific review of the needs and available technologies for process control for many of the coated conductor processing options. This report also addresses generic process monitoring areas in which additional research and development is needed. The concentration is on the two different approaches for obtaining the textured substrates that have been identified as viable candidates. These are the Los Alamos National Laboratory's (LANL) ion-beam assisted deposition, called IBAD, to obtain a highly textured yttria-stabilized zirconia (YSZ) buffer on nickel alloy strips, and Oak Ridge National Laboratory's (ORNL) rolling assisted, bi-axially textured substrate option called RABiTS{trademark}.

  15. Impact of buffer layer and Pt thickness on the interface structure and magnetic properties in (Co/Pt) multilayers

    NASA Astrophysics Data System (ADS)

    Bersweiler, M.; Dumesnil, K.; Lacour, D.; Hehn, M.

    2016-08-01

    The influence of Pt thickness on the interface structure (roughness / intermixing) and magnetic properties has been investigated for (Co / Pt) multilayers sputtered on a Pt or a thin oxide (MgO or AlO x ) buffer layer. When Pt thickness increases from 1.2 nm-2.2 nm, we observe that the effective anisotropy increases with the Pt thickness, simultaneously with the decrease of roughness, i.e. the occurrence of sharper interfaces. Perpendicular magnetic anisotropy (PMA) is still achieved on the oxide buffer layers, but with a lower effective anisotropy correlated to more perturbed interfaces. The detailed analysis of the saturation magnetization shows that: (i) M s is significantly enhanced in the case of rough/intermixed interfaces, which is attributed to and discussed in the framework of Pt induced polarization, (ii) the change in volume dipolar anisotropy is the main factor responsible for the reduction of K eff for systems grown on oxides. Beyond the major role of volume dipolar contribution that reduces PMA, a supplemental positive contribution promoting PMA can be invoked for rough interfaces and large M s (deposit on oxide). This contribution is consistent with a dipolar surface anisotropy term and increases for rough interfaces, in contrast to the Néel surface anisotropy. These opposite variations may interestingly lead to an enhanced anisotropy in (Co / Pt) stackings grown on oxides compared to systems deposited on Pt, i.e. with sharper interfaces.

  16. Impact of buffer layer and Pt thickness on the interface structure and magnetic properties in (Co/Pt) multilayers.

    PubMed

    Bersweiler, M; Dumesnil, K; Lacour, D; Hehn, M

    2016-08-24

    The influence of Pt thickness on the interface structure (roughness / intermixing) and magnetic properties has been investigated for (Co / Pt) multilayers sputtered on a Pt or a thin oxide (MgO or AlO x ) buffer layer. When Pt thickness increases from 1.2 nm-2.2 nm, we observe that the effective anisotropy increases with the Pt thickness, simultaneously with the decrease of roughness, i.e. the occurrence of sharper interfaces. Perpendicular magnetic anisotropy (PMA) is still achieved on the oxide buffer layers, but with a lower effective anisotropy correlated to more perturbed interfaces. The detailed analysis of the saturation magnetization shows that: (i) M s is significantly enhanced in the case of rough/intermixed interfaces, which is attributed to and discussed in the framework of Pt induced polarization, (ii) the change in volume dipolar anisotropy is the main factor responsible for the reduction of K eff for systems grown on oxides. Beyond the major role of volume dipolar contribution that reduces PMA, a supplemental positive contribution promoting PMA can be invoked for rough interfaces and large M s (deposit on oxide). This contribution is consistent with a dipolar surface anisotropy term and increases for rough interfaces, in contrast to the Néel surface anisotropy. These opposite variations may interestingly lead to an enhanced anisotropy in (Co / Pt) stackings grown on oxides compared to systems deposited on Pt, i.e. with sharper interfaces.

  17. Graphene/nitrogen-functionalized graphene quantum dot hybrid broadband photodetectors with a buffer layer of boron nitride nanosheets.

    PubMed

    Tetsuka, Hiroyuki; Nagoya, Akihiro; Tamura, Shin-Ichi

    2016-12-01

    A high performance hybrid broadband photodetector with graphene/nitrogen-functionalized graphene quantum dots (NGQDs@GFET) is developed using boron nitride nanosheets (BN-NSs) as a buffer layer to facilitate the separation and transport of photoexcited carriers from the NGQD absorber. The NGQDs@GFET photodetector with the buffer layer of BN-NSs exhibits enhanced photoresponsivity and detectivity in the deep ultraviolet region of ca. 2.3 × 10(6) A W(-1) and ca. 5.5 × 10(13) Jones without the application of a backgate voltage. The high level of photoresponsivity persists into the near-infrared region (ca. 3.4 × 10(2) A W(-1) and 8.0 × 10(9) Jones). In addition, application in flexible photodetectors is demonstrated by the construction of a structure on a polyethylene terephthalate (PET) substrate. We further show the feasibility of using our flexible photodetectors towards the practical application of infrared photoreflectors. Together with the potential application of flexible photodetectors and infrared photoreflectors, the proposed hybrid photodetectors have potential for use in future graphene-based optoelectronic devices.

  18. Reel-to-reel deposition of epitaxial double-sided MgO buffer layers for coated conductors

    NASA Astrophysics Data System (ADS)

    Xue, Yan; Xiong, Jie; Zhang, Yahui; Zhang, Fei; Zhao, Rui-Peng; Hui, Wang; Wang, Quiling; Cheng, Guo; Zhao, Xiao-Hui; Tao, Bo-Wan

    2016-06-01

    We have successfully employed a double-sided process to deposit MgO buffer layers on both sides of amorphous Y2O3 surface for double-sided YBa2Cu3O7-δ (YBCO) coated conductors (CCs) for the first time, the structure of which is of great prospect to improve the performance and cut the production cost. The biaxial textures of MgO buffer layer are noticeably affected by the ion energy and film thickness, which is demonstrated by X-ray diffraction. The best biaxial texture of double-sided MgO films shows ω-scan of (002) MgO and Φ-scan of (220) MgO yield full width at half maximum values of 4° and 7.8° for one side, respectively, as well as 3.5° and 6.7° for the other side. The subsequent double-sided YBCO films are deposited on the as-prepared MgO template with entire critical current of over 300 A/cm for both sides.

  19. GaN Epitaxial Layer Grown with Conductive Al(x)Ga(1-x)N Buffer Layer on SiC Substrate Using Metal Organic Chemical Vapor Deposition.

    PubMed

    So, Byeongchan; Lee, Kyungbae; Lee, Kyungjae; Heo, Cheon; Pyeon, Jaedo; Ko, Kwangse; Jang, Jongjin; Nam, Okhyun

    2016-05-01

    This study investigated GaN epitaxial layer growth with a conductive Al(x)Ga(1-x)N buffer layer on n-type 4H-SiC by high-temperature metalorganic chemical vapor deposition (HT-MOCVD). The Al composition of the Al(x)Ga(1-x)N buffer was varied from 0% to 100%. In terms of the crystal quality of the GaN layer, 79% Al was the optimal composition of the Al(x)Ga(1-x)N buffer layer in our experiment. A vertical conductive structure was fabricated to measure the current voltage (I-V) characteristics as a function of Al composition, and the I-V curves showed that the resistance increased with increasing Al concentration of the Al(x)Ga(1-x)N buffer layer.

  20. Thin, high quality GaInP compositionally graded buffer layers grown at high growth rates for metamorphic III-V solar cell applications

    NASA Astrophysics Data System (ADS)

    Garcia, I.; France, R. M.; Geisz, J. F.; Simon, J.

    2014-05-01

    The metamorphic growth of lattice-mismatched materials has allowed optimizing the bandgap combination in multijunction solar cells for the solar spectrum under consideration. Buffer structures are used to accommodate the lattice-mismatch by introducing dislocations and relaxing the material in a controlled way. However, the metamorphic buffers typically involve significant growth time and material usage, which increases the cost of these solar cells. In this work, the thinning of buffer structures with continuously, linearly graded misfit is addressed with the goal of increasing the cost-effectiveness of metamorphic multijunction solar cells. The relaxation dynamics and quality of the buffer layers analyzed were assessed by in-situ stress measurements and ex-situ measurements of residual strain, threading dislocation density and surface roughness. Their ultimate quality has been tested using these buffers as templates for the growth of 1 eV Ga0.73In0.27As solar cells. The deleterious effect of thinning the grade layer of these buffer structures from 2 to 1 μm was investigated. It is shown that prompting the relaxation of the buffer by using a stepwise misfit jump at the beginning of the grade layer improves the quality of the thinned buffer structure. The residual threading dislocation density of the optimized thin buffers, grown at a high growth rate of 7 μm/h, is 3×106 cm-2, and solar cells on these buffers exhibit near-ideal carrier collection efficiency and a Voc of 0.62 V at 1-sun direct terrestrial spectrum.

  1. Selective-area growth of vertically oriented GaN nanostructures with a hafnium pre-orienting layer

    NASA Astrophysics Data System (ADS)

    Bae, S.-Y.; Lekhal, K.; Lee, H.-J.; Mitsunari, T.; Min, J.-W.; Lee, D.-S.; Kushimoto, M.; Honda, Y.; Amano, H.

    2017-06-01

    Severe melt-back etching has forced the epitaxy of GaN on Si to use an AlN buffer layer for growing high-quality two-dimensional layers, despite its high resistivity. Herein, we report a metal-based pre-orienting layer (POL) for growing GaN nanostructures (NSs) to replace the traditional AlN buffer layer. Two metals, titanium (Ti) and hafnium (Hf), were evaluated as POLs. We succeeded in fabricating arrays of GaN NSs with highly preferred orientation using selective-area growth. The crystallographic phase of the POLs critically affected the evolved orientation of the crystals. Photoluminescence measurements revealed that GaN NSs with Hf-based POLs were of reasonably high quality. We believe that this result will facilitate broader III-V semiconductor applications using alternative substrates moving beyond conventional Si-based optoelectronics.

  2. Buffering the buffer

    Treesearch

    Leslie M. Reid; Sue Hilton

    1998-01-01

    Riparian buffer strips are a widely accepted tool for helping to sustain aquatic ecosystems and to protect downstream resources and values in forested areas, but controversy persists over how wide a buffer strip is necessary. The physical integrity of stream channels is expected to be sustained if the characteristics and rates of tree fall along buffered reaches are...

  3. Effect of unsintered gadolinium-doped ceria buffer layer on performance of metal-supported solid oxide fuel cells using unsintered barium strontium cobalt ferrite cathode

    NASA Astrophysics Data System (ADS)

    Kim, Yu-Mi; Kim-Lohsoontorn, Pattaraporn; Bae, Joongmyeon

    In this study, a Gd 0.1Ce 0.9O 1.95 (GDC) buffer layer and a Ba 0.5Sr 0.5Co 0.8Fe 0.2O 3- δ (BSCF) cathode, fabricated without pre-sintering, are investigated (unsintered GDC and unsintered BSCF). The effect of the unsintered GDC buffer layer, including the thickness of the layer, on the performance of solid oxide fuel cells (SOFCs) using an unsintered BSCF cathode is studied. The maximum power density of the metal-supported SOFC using an unsintered BSCF cathode without a buffer layer is 0.81 W cm -2, which is measured after 2 h of operation (97% H 2 and 3% H 2O at the anode and ambient air at the cathode), and it significantly decreases to 0.63 W cm -2 after 50 h. At a relatively low temperature of 800 °C, SrZrO 3 and BaZrO 3, arising from interaction between BSCF and yttria-stabilized zirconia (YSZ), are detected after 50 h. Introducing a GDC interlayer between the cathode and electrolyte significantly increases the durability of the cell performance, supporting over 1000 h of cell usage with an unsintered GDC buffer layer. Comparable performance is obtained from the anode-supported cell when using an unsintered BSCF cathode with an unsintered GDC buffer layer (0.75 W cm -2) and sintered GDC buffer layer (0.82 W cm -2). When a sintered BSCF cathode is used, however, the performance increases to 1.23 W cm -2. The adhesion between the BSCF cathode and the cell can be enhanced by an unsintered GDC buffer layer, but an increase in the layer thickness (1-6 μm) increases the area specific resistance (ASR) of the cell, and the overly thick buffer layer causes delamination of the BSCF cathode. Finally, the maximum power densities of the metal-supported SOFC using an unsintered BSCF cathode and unsintered GDC buffer layer are 0.78, 0.64, 0.45 and 0.31 W cm -2 at 850, 800, 750 and 700 °C, respectively.

  4. Device performance and lifetime of polymer:fullerene solar cells with UV-ozone-irradiated hole-collecting buffer layers.

    PubMed

    Lee, Seungsoo; Nam, Sungho; Lee, Hyena; Kim, Hwajeong; Kim, Youngkyoo

    2011-11-18

    We report the influence of UV-ozone irradiation of the hole-collecting buffer layers on the performance and lifetime of polymer:fullerene solar cells. UV-ozone irradiation was targeted at the surface of the poly(3,4-ethylenedioxythiophene): poly(styrenesulfonate) (PEDOT:PSS) layers by varying the irradiation time up to 600 s. The change of the surface characteristics in the PEDOT:PSS after UV-ozone irradiation was measured by employing optical absorption spectroscopy, photoelectron yield spectroscopy, and contact angle measurements, while Raman and X-ray photoelectron spectroscopy techniques were introduced for more microscopic analysis. Results showed that the UV-ozone irradiation changed the chemical structure/composition of the surface of the PEDOT:PSS layers leading to the gradual increase of ionization potential with irradiation time in the presence of up-and-down variations in the contact angle (polarity). This surface property change was attributed to the formation of oxidative components, as evidenced by XPS and Auger electron images, which affected the sheet resistance of the PEDOT:PSS layers. Interestingly, device performance was slightly improved by short irradiation (up to 10 s), whereas it was gradually decreased by further irradiation. The short-duration illumination test showed that the lifetime of solar cells with the UV-ozone irradiated PEDOT:PSS layer was improved due to the protective role of the oxidative components formed upon UV-ozone irradiation against the attack of sulfonic acid groups in the PEDOT:PSS layer to the active layer. Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  5. Tailoring the magnetic anisotropy of CoFeB/MgO stacks onto W with a Ta buffer layer

    NASA Astrophysics Data System (ADS)

    Kaidatzis, Andreas; Bran, Cristina; Psycharis, Vasilios; Vázquez, Manuel; García-Martín, José Miguel; Niarchos, Dimitrios

    2015-06-01

    The emergence of perpendicular magnetic anisotropy (PMA) in CoFeB/MgO stacks deposited on W using a Ta buffer layer is studied as a function of Ta and CoFeB layer thickness and annealing temperature. It is shown that very thin Ta "dusting" layers (thickness between 0.3 and 1 nm) enhance PMA of CoFeB layers grown on top of W. We find that Ta thickness is a crucial factor affecting magnetic anisotropy and it needs to be scaled proportionally to CoFeB thickness for obtaining PMA. Stacks without Ta have in-plane anisotropy, verifying the "PMA-enhancing" role of Ta. The maximum effective PMA energy ( 3.6 ×106 erg/cm3) is obtained for a stack with 1.4 nm of CoFeB and 1 nm of Ta and after annealing at 350 °C . Besides, PMA can be obtained even at the as-deposited state for certain thicknesses. This W-based CoFeB/MgO system could enable the development of low power consumption, high density, and non-volatile magnetic memories.

  6. UV-ozone-treated ultra-thin NaF film as anode buffer layer on organic light emitting devices.

    PubMed

    Chen, Yu-Cheng; Kao, Po-Ching; Chu, Sheng-Yuan

    2010-06-21

    An ultra-thin NaF film was thermally deposited between ITO and NPB as the buffer layer and then treated with the ultraviolet (UV) ozone, in the fabrication of organic light emitting diodes (ITO/NaF/NPB/Alq(3)/LiF/Al) to study its effect on hole-injection properties. The treatment drastically transforms the role of NaF film from hole-blocking to hole-injecting. This transformation is elucidated using hole-only devices, energy band measurement, surface energy, surface polarity, and X-ray photoelectron spectra. With the optimal thickness (3 nm) of the UV-ozone-treated NaF layer, the device performance is significantly improved, with a turn-on voltage, maximum luminance, and maximum current efficiency of 2.5 V, 15700 cd/m(2), and 4.9 cd/A, respectively. Results show that NaF film is not only a hole-blocking layer, but also a promising hole-injecting layer after UV-ozone treatment.

  7. Ca/Alq3 hybrid cathode buffer layer for the optimization of organic solar cells based on a planar heterojunction

    NASA Astrophysics Data System (ADS)

    El Jouad, Z.; Barkat, L.; Stephant, N.; Cattin, L.; Hamzaoui, N.; Khelil, A.; Ghamnia, M.; Addou, M.; Morsli, M.; Béchu, S.; Cabanetos, C.; Richard-Plouet, M.; Blanchard, P.; Bernède, J. C.

    2016-11-01

    Use of efficient anode cathode buffer layer (CBL) is crucial to improve the efficiency of organic photovoltaic cells. Here we show that using a double CBL, Ca/Alq3, allows improving significantly cell performances. The insertion of Ca layer facilitates electron harvesting and blocks hole collection, leading to improved charge selectivity and reduced leakage current, whereas Alq3 blocks excitons. After optimisation of this Ca/Alq3 CBL using CuPc as electron donor, it is shown that it is also efficient when SubPc is substituted to CuPc in the cells. In that case we show that the morphology of the SubPc layer, and therefore the efficiency of the cells, strongly depends on the deposition rate of the SubPc film. It is necessary to deposit slowly (0.02 nm/s) the SubPc films because at higher deposition rate (0.06 nm/s) the films are porous, which induces leakage currents and deterioration of the cell performances. The SubPc layers whose formations are kinetically driven at low deposition rates are more uniform, whereas those deposited faster exhibit high densities of pinholes.

  8. Synthesis and characterization of (Cd,Zn)S buffer layer for Cu2ZnSnSe4 solar cells

    NASA Astrophysics Data System (ADS)

    Ben Messaoud, Khaled; Buffière, Marie; Brammertz, Guy; Lenaers, Nick; Boyen, Hans-Gerd; Sahayaraj, Sylvester; Meuris, Marc; Amlouk, Mosbah; Poortmans, Jef

    2017-07-01

    In order to improve the electrical performances of Cu2ZnSnSe4 (CZTSe) based solar cells, the standard CdS buffer layer was replaced by (Cd,Zn)S processed by chemical bath deposition. The morphology and composition of the (Cd,Zn)S thin films were studied as a function of [Zn]/([Zn]  +  [Cd]) ratio in the chemical bath (80, 85 and 90%). The CZTSe/(Cd,Zn)S solar cells with and without Cd partial electrolyte (Cd PE) treatment were compared to CZTSe/CdS reference devices using current-voltage and external quantum efficiency measurements. The (Cd,Zn)S thin films show a non-homogeneity of Zn distribution and phase formation, with a shift from Zn(O,OH) x to ZnS phase when increasing the deposition time and a decrease of the layers thicknesses when increasing the Zn concentration in chemical bath. A model for the growth of (Cd,Zn)S thin films is proposed. The resulting CZTSe/(Cd,Zn)S devices show an important reduction of the barrier at the hetero-interface, which is attributed to the lower density of O contamination in (Cd,Zn)S compared to CdS, inducing a lower density of deep p-type recombination centers. Despite the reduced compensation of the buffer layer, CZTSe/(Cd,Zn)S devices show a deterioration of the open circuit voltage and the fill factor with the increase of Zn content in (Cd,Zn)S. These electrical losses were avoided by Cd PE treatment prior to the deposition of (Cd,Zn)S.

  9. Self-assembled, aligned ZnO nanorod buffer layers for high-current-density, inverted organic photovoltaics.

    PubMed

    Rao, Arun D; Karalatti, Suresh; Thomas, Tiju; Ramamurthy, Praveen C

    2014-10-08

    Two different soft-chemical, self-assembly-based solution approaches are employed to grow zinc oxide (ZnO) nanorods with controlled texture. The methods used involve seeding and growth on a substrate. Nanorods with various aspect ratios (1-5) and diameters (15-65 nm) are grown. Obtaining highly oriented rods is determined by the way the substrate is mounted within the chemical bath. Furthermore, a preheat and centrifugation step is essential for the optimization of the growth solution. In the best samples, we obtain ZnO nanorods that are almost entirely oriented in the (002) direction; this is desirable since electron mobility of ZnO is highest along this crystallographic axis. When used as the buffer layer of inverted organic photovoltaics (I-OPVs), these one-dimensional (1D) nanostructures offer: (a) direct paths for charge transport and (b) high interfacial area for electron collection. The morphological, structural, and optical properties of ZnO nanorods are studied using scanning electron microscopy, X-ray diffraction, and ultraviolet-visible light (UV-vis) absorption spectroscopy. Furthermore, the surface chemical features of ZnO films are studied using X-ray photoelectron spectroscopy and contact angle measurements. Using as-grown ZnO, inverted OPVs are fabricated and characterized. For improving device performance, the ZnO nanorods are subjected to UV-ozone irradiation. UV-ozone treated ZnO nanorods show: (i) improvement in optical transmission, (ii) increased wetting of active organic components, and (iii) increased concentration of Zn-O surface bonds. These observations correlate well with improved device performance. The devices fabricated using these optimized buffer layers have an efficiency of ∼3.2% and a fill factor of 0.50; this is comparable to the best I-OPVs reported that use a P3HT-PCBM active layer.

  10. 19.5%-Efficient CuIn1-xGaxSe2 Photovoltaic Cells Using A Cd-Zn-S Buffer Layer

    SciTech Connect

    Bhattacharya. R. N.

    2008-01-01

    CuIn1-xGaxSe2 (CIGS) solar cell junctions prepared by chemical-bath-deposited (CBD) Zn1-xCdxS (CdZnS), ZnS, and CdS buffer layers are discussed. A 19.52%-efficient, CIGS-based, thin-film photovoltaic device has been fabricated using a single-layer CBD CdZnS buffer layer. The mechanism that creates extensive hydroxide and oxide impurities in CBD-ZnS and CBD-CdZnS thin films (compared to CBD-CdS thin film) is presented.

  11. Efficiency enhancement of polymer solar cells by applying poly(vinylpyrrolidone) as a cathode buffer layer via spin coating or self-assembly.

    PubMed

    Wang, Haitao; Zhang, Wenfeng; Xu, Chenhui; Bi, Xianghong; Chen, Boxue; Yang, Shangfeng

    2013-01-01

    A non-conjugated polymer poly(vinylpyrrolidone) (PVP) was applied as a new cathode buffer layer in P3HT:PCBM bulk heterojunction polymer solar cells (BHJ-PSCs), by means of either spin coating or self-assembly, resulting in significant efficiency enhancement. For the case of incorporation of PVP by spin coating, power conversion efficiency (PCE) of the ITO/PEDOT:PSS/P3HT:PCBM/PVP/Al BHJ-PSC device (3.90%) is enhanced by 29% under the optimum PVP spin-coating speed of 3000 rpm, which leads to the optimum thickness of PVP layer of ~3 nm. Such an efficiency enhancement is found to be primarily due to the increase of the short-circuit current (J(sc)) (31% enhancement), suggesting that the charge collection increases upon the incorporation of a PVP cathode buffer layer, which originates from the conjunct effects of the formation of a dipole layer between P3HT:PCBM active layer and Al electrodes, the chemical reactions of PVP molecules with Al atoms, and the increase of the roughness of the top Al film. Incorporation of PVP layer by doping PVP directly into the P3HT:PCBM active layer leads to an enhancement of PCE by 13% under the optimum PVP doping ratio of 3%, and this is interpreted by the migration of PVP molecules to the surface of the active layer via self-assembly, resulting in the formation of the PVP cathode buffer layer. While the formation of the PVP cathode buffer layer is fulfilled by both fabrication methods (spin coating and self-assembly), the dependence of the enhancement of the device performance on the thickness of the PVP cathode buffer layer formed by self-assembly or spin coating is different, because of the different aggregation microstructures of the PVP interlayer.

  12. Improved high temperature integration of Al{sub 2}O{sub 3} on MoS{sub 2} by using a metal oxide buffer layer

    SciTech Connect

    Son, Seokki; Choi, Moonseok; Kim, Dohyung; Choi, Changhwan; Yu, Sunmoon

    2015-01-12

    We deposited a metal oxide buffer layer before atomic layer deposition (ALD) of Al{sub 2}O{sub 3} onto exfoliated molybdenum disulfide (MoS{sub 2}) in order to accomplish enhanced integration. We demonstrate that even at a high temperature, functionalization of MoS{sub 2} by means of a metal oxide buffer layer can effectively provide nucleation sites for ALD precursors, enabling much better surface coverage of Al{sub 2}O{sub 3}. It is shown that using a metal oxide buffer layer not only allows high temperature ALD process, resulting in highly improved quality of Al{sub 2}O{sub 3}/MoS{sub 2} interface, but also leaves MoS{sub 2} intact.

  13. Improvement of transmission properties of visible pilot beam for polymer-coated silver hollow fibers with acrylic silicone resin as buffer layer for sturdy structure

    NASA Astrophysics Data System (ADS)

    Iwai, Katsumasa; Takaku, Hiroyuki; Miyagi, Mitsunobu; Shi, Yi-Wei; Zhu, Xiao-Song; Matsuura, Yuji

    2017-02-01

    Flexible hollow fibers with 530-μm-bore size were developed for infrared laser delivery. Sturdy hollow fibers were fabricated by liquid-phase coating techniques. A silica glass capillary is used as the substrate. Acrylic silicone resin is used as a buffer layer and the buffer layer is firstly coated on the inner surface of the capillary to protect the glass tube from chemical damages due to the following silver plating process. A silver layer was inner-plated by using the conventional silver mirror-plating technique. To improve adhesion of catalyst to the buffer layer, a surface conditioner has been introduced in the method of silver mirror-plating technique. We discuss improvement of transmission properties of sturdy polymer-coated silver hollow fibers for the Er:YAG laser and red pilot beam delivery.

  14. Quantum transport modeling of the symmetric Fe/FeO0.5/MgO magnetic tunnel junction: the effects of correlations in the buffer layer.

    PubMed

    Timoshevskii, Vladimir; Hu, Yibin; Marcotte, Étienne; Guo, Hong

    2014-01-08

    We report ab initio simulations of quantum transport properties of Fe/MgO/Fe trilayer structures with FeO0.5 buffer iron oxide layer, where on-site Coulomb interaction is explicitly taken into account by local density approximation + Hubbard U approach. We show that on-site Coulomb repulsion in the iron-oxygen layer can cause a dramatic drop of the tunnel magnetoresistance of the system. We present an understanding of microscopic details of this phenomenon, connecting it to localization of electronic states of particular symmetry, which takes place in the buffer Fe-O layer, when on-site Coulomb repulsion is introduced. We further study the possible influence of the symmetry reduction in the buffer Fe-O layer on the transport properties of the Fe/MgO/Fe interface.

  15. High performance organic photovoltaics with zinc oxide and graphene oxide buffer layers.

    PubMed

    Yusoff, Abd Rashid bin Mohd; Kim, Hyeong Pil; Jang, Jin

    2014-01-01

    We report air stable inverted organic photovoltaics (OPVs) incorporating graphene oxide (GO) and solution processed zinc oxide (ZnO) as hole transport and electron transport layers, respectively. Both the hole transport layer and the electron transport layer (HTL and ETL) are of advantage in high transparency and environmental stability. The use of GO and ZnO in poly(2,7-carbazole) derivative (PCDTBT):fullerene derivative (PC₇₀BM)-based inverted OPVs leads to an improved device stability and enhanced high open circuit voltage (V(oc)) of 0.81 V, a short-circuit current density (J(sc)) of 14.10 mA cm(-2), and a fill factor (FF) of 54.44 along with a power conversion efficiency of 6.20%.

  16. High performance organic photovoltaics with zinc oxide and graphene oxide buffer layers

    NASA Astrophysics Data System (ADS)

    Mohd Yusoff, Abd Rashid Bin; Kim, Hyeong Pil; Jang, Jin

    2014-01-01

    We report air stable inverted organic photovoltaics (OPVs) incorporating graphene oxide (GO) and solution processed zinc oxide (ZnO) as hole transport and electron transport layers, respectively. Both the hole transport layer and the electron transport layer (HTL and ETL) are of advantage in high transparency and environmental stability. The use of GO and ZnO in poly(2,7-carbazole) derivative (PCDTBT):fullerene derivative (PC70BM)-based inverted OPVs leads to an improved device stability and enhanced high open circuit voltage (Voc) of 0.81 V, a short-circuit current density (Jsc) of 14.10 mA cm-2, and a fill factor (FF) of 54.44 along with a power conversion efficiency of 6.20%.

  17. Effect of tensile-strained Si layer on photoluminescence of Ge(Si) self-assembled islands grown on relaxed SiGe/Si(001) buffer layers

    SciTech Connect

    Shaleev, M. V. Novikov, A. V.; Yablonskii, A. N.; Kuznetsov, O. A.; Drozdov, Yu. N.; Krasil'nik, Z. F.

    2007-02-15

    The results of studying the photoluminescence of the structures with Ge(Si) self-assembled islands embedded into tensile-strained Si layer are reported. The structures were grown on smooth relaxed Si{sub 1-x}Ge{sub x}/Si(001) (x = 0.2-0.3) buffer layers. The photoluminescence peak found in the photoluminescence spectra of the studied structures is related to the indirect (in real space) optical transition between the holes localized in the Ge(Si) islands and electrons localized in the tensile-strained Si layers under and above an island. It is shown that one can efficiently control the position of the photoluminescence peak for a specified type of structure by varying the thickness of the strained Si layers. It is found that, at 77 K, the intensity of the photoluminescence signal from the heterostructures with Ge(Si) self-assembled islands contained between the tensile-strained Si layers exceeds by an order of magnitude the intensity of the photoluminescence signal from the GeSi structures with islands formed on the Si(001) substrates.

  18. Evaluation of methods for application of epitaxial buffer and superconductor layers

    SciTech Connect

    1999-03-30

    The recent achievements of critical currents exceeding million amperes per square centimeter at 77K in YBCO deposited over suitably textured substrate have stimulated interest in the potential applications of coated conductors at high temperatures and in high magnetic fields. Currently, ion-beam assisted deposition (IBAD), and rolling assisted bi-axially textured substrate (RABiTS), represent two available options for obtaining textured substrates. For applying suitable coatings of buffer and high temperature superconductor (HTS) material over textured substrates, several options are available which include sputtering, electron-beam evaporation, laser ablation, electrophoresis, chemical vapor deposition (including metal organics chemical vapor deposition), sol-gel, metal organics decomposition, electrodeposition and aerosol/spray pyrolysis. A commercial continuous long-length wire/tape manufacturing scheme developed out of any suitable combination of the above techniques would consist of operations involving preparation of the substrate and application of buffer, HTS and passivation/insulation materials and special treatment steps such as post-annealing. These operations can be effected by various process parameters that can be classified into chemistry, materials, engineering and environmental related parameters. Under the DOE-sponsored program, to carry out an engineering evaluation, first, the process flow schemes were developed for various candidate options identifying the major operating steps, process conditions, and process streams. Next, to evaluate quantifiable parameters such as process severity (e.g. temperature and pressure), coating thickness and deposition rate for HTS material, achieved maximum J{sub c} value (for films >1{micro}m thick) and cost of chemical and material utilization efficiency, the multi-attribute method was used to determine attributes/merits for various parameters and candidate options. To determine similar attribute values for the

  19. Effects of BaTiO3 and SrTiO3 as the buffer layers of epitaxial BiFeO3 thin films

    NASA Astrophysics Data System (ADS)

    Feng, Yu; Wang, Can; Tian, ShiLu; Zhou, Yong; Ge, Chen; Guo, HaiZhong; He, Meng; Jin, KuiJuan; Yang, GuoZhen

    2017-06-01

    BiFeO3 (BFO) thin films with BaTiO3 (BTO) or SrTiO3 (STO) as buffer layer were epitaxially grown on SrRuO3-covered SrTiO3 substrates. X-ray diffraction measurements show that the BTO buffer causes tensile strain in the BFO films, whereas the STO buffer causes compressive strain. Different ferroelectric domain structures caused by these two strain statuses are revealed by piezoelectric force microscopy. Electrical and magnetical measurements show that the tensile-strained BFO/BTO samples have reduced leakage current and large ferroelectric polarization and magnetization, compared with compressively strained BFO/STO. These results demonstrate that the electrical and magnetical properties of BFO thin films can be artificially modified by using a buffer layer.

  20. Hexagonal AlN: Dimensional-crossover-driven band-gap transition

    NASA Astrophysics Data System (ADS)

    Bacaksiz, C.; Sahin, H.; Ozaydin, H. D.; Horzum, S.; Senger, R. T.; Peeters, F. M.

    2015-02-01

    Motivated by a recent experiment that reported the successful synthesis of hexagonal (h ) AlN [Tsipas et al., Appl. Phys. Lett. 103, 251605 (2013), 10.1063/1.4851239], we investigate structural, electronic, and vibrational properties of bulk, bilayer, and monolayer structures of h -AlN by using first-principles calculations. We show that the hexagonal phase of the bulk h -AlN is a stable direct-band-gap semiconductor. The calculated phonon spectrum displays a rigid-layer shear mode at 274 cm-1 and an Eg mode at 703 cm-1, which are observable by Raman measurements. In addition, single-layer h -AlN is an indirect-band-gap semiconductor with a nonmagnetic ground state. For the bilayer structure, A A' -type stacking is found to be the most favorable one, and interlayer interaction is strong. While N -layered h -AlN is an indirect-band-gap semiconductor for N =1 -9 , we predict that thicker structures (N ≥10 ) have a direct band gap at the Γ point. The number-of-layer-dependent band-gap transitions in h -AlN is interesting in that it is significantly different from the indirect-to-direct crossover obtained in the transition-metal dichalcogenides.

  1. Effect of rear-surface buffer layer on performance of lift-off Cu(In,Ga)Se2 solar cells

    NASA Astrophysics Data System (ADS)

    Aoyagi, Kenta; Tamura, Akihiro; Takakura, Hideyuki; Minemoto, Takashi

    2014-01-01

    The effect of an Au and MoOx rear-surface buffer layer inserted between Cu(In,Ga)Se2 (CIGS) and ZnO:Al on solar cell performances was examined. The lift-off CIGS solar cell without a rear-surface buffer layer showed particular characteristics of two series-connected diodes in the reverse direction, and its short-circuit current density was almost zero. In contrast, the Au or MoOx rear-surface buffer layer improved these characteristics. Although the lift-off CIGS solar cell with the Au rear-surface buffer layer showed shunt characteristics and low efficiency, the efficiency of the lift-off CIGS solar cell with the MoOx rear-surface buffer layer was approximately 50% of that of substrate-type CIGS solar cells. Diode parameters of lift-off CIGS solar cells were determined by fitting analysis of current density-voltage curves using a proposed new equivalent circuit model for lift-off CIGS solar cells.

  2. Optimization of the ZnS Buffer Layer by Chemical Bath Deposition for Cu(In,Ga)Se2 Solar Cells.

    PubMed

    Jeon, Dong-Hwan; Hwang, Dae-Kue; Kim, Dae-Hwan; Kang, Jin-Kyu; Lee, Chang-Seop

    2016-05-01

    We evaluated a ZnS buffer layer prepared using a chemical bath deposition (CBD) process for application in cadmium-free Cu(In,Ga)Se2 (CIGS) solar cells. The ZnS buffer layer showed good transmittance (above 90%) in the spectral range from 300 to 800 nm and was non-toxic compared with the CdS buffer layers normally used in CIGS solar cells. The CBD process was affected by several deposition conditions. The deposition rate was dependent on the ammonia concentration (complexing agent). When the ammonia concentration was either too high or low, a decrease in the deposition rate was observed. In addition, post heat treatments at high temperatures had detrimental influences on the ZnS buffer layers because portions of the ZnS thin films were transformed into ZnO. With optimized deposition conditions, a CIGS solar cell with a ZnS buffer layer showed an efficiency of 14.18% with a 0.23 cm2 active area under 100 mW/cm2 illumination.

  3. Ge and GeOx films as sacrificial layer for MEMS technology based on piezoelectric AlN: etching and planarization processes (Invited Paper)

    NASA Astrophysics Data System (ADS)

    Sangrador, J.; Olivares, J.; Iborra, E.; Vergara, L.; Clement, M.; Sanz-Hervas, A.

    2005-07-01

    In this article we present a study of deposition and etching techniques of germanium (Ge) and amorphous oxygen germanium (GeOx) films, with the aim of using them as sacrificial layer in the fabrication of AlN-based MEMS by surface micromachining processes. The Ge and GeOx layers were deposited by RF magnetron sputtering in Ar and Ar/O2 atmospheres. By controlling the process parameters we were able to set the final composition of the GeOx films, which was assessed by FTIR measurements. We have studied the etch rates of GeOx films with x ranging from 0 to 1 in H2O2 and H2O2/acid solutions. Depending on the etching temperature and the oxygen content in the layers, etch rates ranging from 0.2 to 2 μm/min were obtained. Nearly stoichiometric germanium oxide (GeO2) was etched in pure H2O at very high rate (>1 μm/min at room temperature). We have also developed a chemomechanical polishing (CMP) process for the planarization of Ge and GeOx. The influence of the slurries containing diverse powders (CeO2, Al2O3) and chemical agents (NH4OH, HCl), the different pads, and the various process parameters on the removal rate and the final sample topography has been studied. Finally, we have analysed the compatibility of the materials involved in the process flow with the processes of planarization and removal of the sacrificial layers.

  4. Finding the lost open-circuit voltage in polymer solar cells by UV-ozone treatment of the nickel acetate anode buffer layer.

    PubMed

    Wang, Fuzhi; Sun, Gang; Li, Cong; Liu, Jiyan; Hu, Siqian; Zheng, Hua; Tan, Zhan'ao; Li, Yongfang

    2014-06-25

    Efficient polymer solar cells (PSCs) with enhanced open-circuit voltage (Voc) are fabricated by introducing solution-processed and UV-ozone (UVO)-treated nickel acetate (O-NiAc) as an anode buffer layer. According to X-ray photoelectron spectroscopy data, NiAc partially decomposed to NiOOH during the UVO treatment. NiOOH is a dipole species, which leads to an increase in the work function (as confirmed by ultraviolet photoemission spectroscopy), thus benefitting the formation of ohmic contact between the anode and photoactive layer and leading to increased Voc. In addition, the UVO treatment improves the wettability between the substrate and solvent of the active layer, which facilitates the formation of an upper photoactive layer with better morphology. Further, the O-NiAc layer can decrease the series resistance (Rs) and increase the parallel resistance (Rp) of the devices, inducing enhanced Voc in comparison with the as-prepared NiAc-buffered control devices without UVO treatment. For PSCs based on the P3HT:PCBM system, Voc increases from 0.50 to 0.60 V after the NiAc buffer layer undergoes UVO treatment. Similarly, in the P3HT:ICBA system, the Voc value of the device with a UVO-treated NiAc buffer layer increases from 0.78 to 0.88 V, showing an enhanced power conversion efficiency of 6.64%.

  5. Inverted polymer solar cell using `Ta' doped V2O5 thin film as cathodic buffer layer

    NASA Astrophysics Data System (ADS)

    Kovendhan, M.; Joseph, D. Paul; Babu, K. Sowri; Sendilkumar, A.

    2017-05-01

    `Ta' 8 wt % doped V2O5 thin film was deposited onto ITO substrate by thermal evaporation method. The XRD pattern confirms the film to be polycrystalline with orthorhombic structure. The SEM image show a smooth spongy bush like structure. Transparency of `Ta' 8 wt % doped V2O5 film is around 35% in visible region and it decreased in IR region. Transport properties were studied by Hall effect measurements. Inverted polymer solar cell using `Ta' 8 wt % doped V2O5 thin film as cathodic buffer layer with device structure ITO/`Ta' 8 wt % V2O5/P3HT:PCBM/MoO3/Ag has been fabricated and studied.

  6. Nano LaAlO3 buffer layer-assisted tunneling current in manganite p-n heterojunction

    NASA Astrophysics Data System (ADS)

    Ma, Jun-Jie; Wang, Deng-Jing; Huang, Hai-Lin; Wang, Ru-Wu; Li, Yun-Bao

    2015-10-01

    An oxide p-n heterojunction composed of a 150-nm La0.67Ca0.33MnO3 (LCMO) film, 0.05 wt% Nb doped SrTiO3 substrate (STON), and sandwiched 5-nm LaAlO3 (LAO) thin film is fabricated with the pulsed laser deposition technique and the interfacial transport properties are experimentally studied. The rectifying behavior of the junction is in agreement with Newman’s equation, indicating that tunneling is the dominant process for the carriers to pass through the interface while thermal emission is the dominant transport model of an LCMO/STON heterojunction with no LAO buffer layer. Project supported by the National Natural Science Foundation of China (Grant No. 10804089).

  7. Amphiphilic fullerene/ZnO hybrids as cathode buffer layers to improve charge selectivity of inverted polymer solar cells

    NASA Astrophysics Data System (ADS)

    Hu, Ting; Chen, Lie; Yuan, Kai; Chen, Yiwang

    2015-05-01

    Two types of novel fullerene derivative/ZnO hybrids were prepared by physically blending amphiphilic fullerene-end-capped poly(ethylene glycol) (C60-PEG) with ZnO nanocrystals (ZnO/C60-PEG) and by in situ grown ZnO from C60-PEG (ZnO@C60-PEG) at relatively low temperatures. The C60-PEG could act as n-doping on the ZnO while the PEG side chain of C60-PEG could passivate the defects of the ZnO at the same time, consequently increasing the lowest unoccupied molecular orbital (LUMO) level. Compared with the ZnO/C60-PEG by the physical blend approach, the ZnO@C60-PEG by the growth approach showed a more favorable morphology and higher electron mobility by developing a homogeneous network. As a consequence, the efficiency of the inverted polymer solar cells based on thieno[3,4-b]-thiophene/benzodithiophene (PTB7):[6,6]-phenyl C71-butyric acid methyl ester (PC71BM) is raised to 8.0% for the ZnO@C60-PEG cathode buffer layer and to 7.5% for the ZnO/C60-PEG cathode buffer layer with improved long-term stability.Two types of novel fullerene derivative/ZnO hybrids were prepared by physically blending amphiphilic fullerene-end-capped poly(ethylene glycol) (C60-PEG) with ZnO nanocrystals (ZnO/C60-PEG) and by in situ grown ZnO from C60-PEG (ZnO@C60-PEG) at relatively low temperatures. The C60-PEG could act as n-doping on the ZnO while the PEG side chain of C60-PEG could passivate the defects of the ZnO at the same time, consequently increasing the lowest unoccupied molecular orbital (LUMO) level. Compared with the ZnO/C60-PEG by the physical blend approach, the ZnO@C60-PEG by the growth approach showed a more favorable morphology and higher electron mobility by developing a homogeneous network. As a consequence, the efficiency of the inverted polymer solar cells based on thieno[3,4-b]-thiophene/benzodithiophene (PTB7):[6,6]-phenyl C71-butyric acid methyl ester (PC71BM) is raised to 8.0% for the ZnO@C60-PEG cathode buffer layer and to 7.5% for the ZnO/C60-PEG cathode buffer layer

  8. Solvent effects of a dimethyldicyanoquinonediimine buffer layer as N-type material on the performance of organic photovoltaic cells.

    PubMed

    Yang, Eui Yeol; Oh, Se Young

    2014-08-01

    In the present work, we have fabricated organic photovoltaic cells consisting of ITO/PEDOT:PSS/P3HT:PCBM/DMDCNQI/Al using a dip-coating method with various solvent systems. We have investigated solvent effects (such as solubility, viscosity and vapor pressure) in deposition of a thin DMDCNQI buffer layer on the performance of organic photovoltaic cells. The solvent system which had low viscosity and good solubility properties, made a dense and uniform DMDCNQI ultra thin film, resulting in a high performance device. In particular, a prepared organic photovoltaic cell was fabricated using a cosolvent system (methanol:methylenechloride = 3:1) and showed a maximum power conversion efficiency of 4.53%.

  9. Magnetic anisotropy of crystalline Fe films grown on (001) GaAs substrates using Ge buffer layers

    NASA Astrophysics Data System (ADS)

    Bac, Seul-Ki; Lee, Hakjoon; Lee, Sangyeop; Choi, Seonghoon; Yoo, Taehee; Lee, Sanghoon; Liu, X.; Furdyna, J. K.

    2016-05-01

    Magnetic anisotropy of Fe films grown on (001) GaAs substrates using Ge buffer layers were investigated by planar Hall effect measurements. In addition to phenomena arising from dominant cubic symmetry of the Fe specimen, the study of angular dependence of magnetization reversal revealed breaking of this symmetry in the form of systematic asymmetric shifts of magnetic hysteresis loops around the <110 > crystallographic directions. We ascribe such symmetry breaking to an admixture of uniaxial anisotropy associated with the [100] direction in the Fe film. To determine the parameters associated with this uniaxial anisotropy, we quantitatively analyze the asymmetric shifts of the hysteresis loop centers from the <110 > directions. Even though the value of these parameters turns out to be relatively small compared to that of the cubic anisotropy (by about two orders of magnitude), they survive up to room temperature.

  10. Preparation of high-quality AlN on sapphire by high-temperature face-to-face annealing

    NASA Astrophysics Data System (ADS)

    Miyake, Hideto; Lin, Chia-Hung; Tokoro, Kenta; Hiramatsu, Kazumasa

    2016-12-01

    The annealing of sputtered AlN films with different thicknesses grown on sapphire in nitrogen ambient was investigated. In the annealing, two AlN films on sapphire were overlapped ;face-to-face; to suppress the thermal decomposition of the AlN films. The sputtered AlN films with small grains consisted of columnar structure were initially aligned with (0002) orientation but became slightly inclined with increasing film thickness resulting in the formation of a two-layer structure. After annealing, films became a single crystalline layer regardless of the film thickness, and their crystallinity markedly improved after annealing at 1600-1700 °C. The full widths at half maximum of the (0002)- and (10 1 bar2)-plane X-ray rocking curves were improved to 49 and 287 arcsec, respectively, owing to the annihilation of domain boundaries in the sputtered AlN films, which concurrently increased the compressive stress in the films.

  11. Improved structural quality of AlN grown on sapphire by 3D/2D alternation growth

    NASA Astrophysics Data System (ADS)

    Guo, Yanmin; Fang, Yulong; Yin, Jiayun; Zhang, Zhirong; Wang, Bo; Li, Jia; Lu, Weili; Feng, Zhihong

    2017-04-01

    Three dimensional (3D) and two dimensional (2D) alternation growth was used to grow AlN epitaxial layers on sapphire substrates. AlN samples grown using this technique have higher crystalline quality and lower dislocation density than samples grown using only 3D or 2D growth modes as witnessed by the high-resolution X-ray diffraction. Smooth atomic terraces with root mean square roughness of 0.107 nm were observed using atomic force microscopy (AFM) when the 3D and 2D AlN were 75 nm and 425 nm, respectively. This sample possesses single crystallographic orientation along the c-axis identified by Raman spectroscopy. Furthermore, the 3D/2D alternating growth mode modulates internal stress in AlN epitaxial layer by adjusting 2D AlN thickness, and the mechanism was studied in detail.

  12. Effect of dopent on the structural and optical properties of ZnS thin film as a buffer layer in solar cell application

    SciTech Connect

    Vashistha, Indu B. Sharma, S. K.; Sharma, Mahesh C.; Sharma, Ramphal

    2015-08-28

    In order to find the suitable alternative of toxic CdS buffer layer, deposition of pure ZnS and doped with Al by chemical bath deposition method have been reported. Further as grown pure and doped thin films have been annealed at 150°C. The structural and surface morphological properties have been characterized by X-Ray diffraction (XRD) and Atomic Force Microscope (AFM).The XRD analysis shows that annealed thin film has been polycrystalline in nature with sphalerite cubic crystal structure and AFM images indicate increment in grain size as well as growth of crystals after annealing. Optical measurement data give band gap of 3.5 eV which is ideal band gap for buffer layer for solar cell suggesting that the obtained ZnS buffer layer is suitable in a low-cost solar cell.

  13. The effects of buffer layers on the performance and stability of flexible InGaZnO thin film transistors on polyimide substrates

    SciTech Connect

    Ok, Kyung-Chul; Park, Jin-Seong E-mail: jsparklime@hanyang.ac.kr; Ko Park, Sang-Hee; Kim, H. E-mail: jsparklime@hanyang.ac.kr; Hwang, Chi-Sun; Soo Shin, Hyun; Bae, Jonguk

    2014-02-10

    We demonstrated the fabrication of flexible amorphous indium gallium zinc oxide thin-film transistors (TFTs) on high-temperature polyimide (PI) substrates, which were debonded from the carrier glass after TFT fabrication. The application of appropriate buffer layers on the PI substrates affected the TFT performance and stability. The adoption of the SiN{sub x}/AlO{sub x} buffer layers as water and hydrogen diffusion barriers significantly improved the device performance and stability against the thermal annealing and negative bias stress, compared to single SiN{sub x} or SiO{sub x} buffer layers. The substrates could be bent down to a radius of curvature of 15 mm and the devices remained normally functional.

  14. Air processed organic photovoltaic devices incorporating a MoOx anode buffer layer

    NASA Astrophysics Data System (ADS)

    Bovill, Edward S. R.; Griffin, Jonathan; Wang, Tao; Kingsley, James W.; Yi, Hunan; Iraqi, Ahmed; Buckley, Alastair R.; Lidzey, David G.

    2013-05-01

    Molybdenum oxide (MoOx) has been shown to act as an efficient hole extraction layer in organic photovoltaic (OPV) devices. However, exposing MoOx films to air is problematic as it is hygroscopic; the uptake of moisture having a negative impact on its electronic properties. Here, we use spectroscopic ellipsometry to characterise the uptake of water, and fabricate PCDTBT:PC70BM based OPVs to determine its effects on device performance. We then show that thermally annealing MoOx reduces its hygroscopicity, permitting it to be processed in air. Using this process, we create air-processsed OPVs having PCEs (power conversion efficiencies) of up to 5.36%.

  15. Epitaxy of CdTe on sapphire substrates with titanium buffer layers

    NASA Astrophysics Data System (ADS)

    Muslimov, A. E.; Butashin, A. V.; Kanevsky, V. M.; Babaev, V. A.; Alikhanov, N. M.-R.

    2017-05-01

    The formation of a developed electrical relief on the sapphire substrate surface is investigated. A technique is proposed for introducing Ti4+ impurity atoms into the sapphire crystal lattice by depositing titanium layers with a thickness of about 5 nm and their annealing in air (oxidizing atmosphere) to a temperature of 1400°C. It is shown that this preliminary treatment of the sapphire substrate surface results in epitaxial growth of (111) CdTe films parallel to the sapphire (0001) plane at a temperature of 350°C.

  16. High quality Ge epilayer on Si (1 0 0) with an ultrathin Si1-x Ge x /Si buffer layer by RPCVD

    NASA Astrophysics Data System (ADS)

    Chen, Da; Guo, Qinglei; Zhang, Nan; Xu, Anli; Wang, Bei; Li, Ya; Wang, Gang

    2017-07-01

    The authors report a method to grow high quality strain-relaxed Ge epilayer on a combination of low temperature Ge seed layer and Si1-x Ge x /Si superlattice buffer layer by reduced pressure chemical vapor deposition system without any subsequent annealing treatment. Prior to the growth of high quality Ge epilayer, an ultrathin Si1-x Ge x /Si superlattice buffer layer with the thickness of 50 nm and a 460 nm Ge seed layer were deposited successively at low temperature. Then an 840 nm Ge epilayer was grown at high deposition rate with the surface root-mean-square roughness of 0.707 nm and threading dislocation density of 2.5  ×  106 cm-2, respectively. Detailed investigations of the influence of ultrathin low-temperature Si1-x Ge x /Si superlattice buffer layer on the quality of Ge epilayer were performed, which indicates that the crystalline quality of Ge epilayer can be significantly improved by enhancing the Ge concentration of Si1-x Ge x /Si superlattice buffer layer.

  17. Surface acoustic wave devices on AlN/3C-SiC/Si multilayer structures

    NASA Astrophysics Data System (ADS)

    Lin, Chih-Ming; Chen, Yung-Yu; Felmetsger, Valery V.; Lien, Wei-Cheng; Riekkinen, Tommi; Senesky, Debbie G.; Pisano, Albert P.

    2013-02-01

    Surface acoustic wave (SAW) propagation characteristics in a multilayer structure including a piezoelectric aluminum nitride (AlN) thin film and an epitaxial cubic silicon carbide (3C-SiC) layer on a silicon (Si) substrate are investigated by theoretical calculation in this work. Alternating current (ac) reactive magnetron sputtering was used to deposit highly c-axis-oriented AlN thin films, showing the full width at half maximum (FWHM) of the rocking curve of 1.36° on epitaxial 3C-SiC layers on Si substrates. In addition, conventional two-port SAW devices were fabricated on the AlN/3C-SiC/Si multilayer structure and SAW propagation properties in the multilayer structure were experimentally investigated. The surface wave in the AlN/3C-SiC/Si multilayer structure exhibits a phase velocity of 5528 m s-1 and an electromechanical coupling coefficient of 0.42%. The results demonstrate the potential of AlN thin films grown on epitaxial 3C-SiC layers to create layered SAW devices with higher phase velocities and larger electromechanical coupling coefficients than SAW devices on an AlN/Si multilayer structure. Moreover, the FWHM values of rocking curves of the AlN thin film and 3C-SiC layer remained constant after annealing for 500 h at 540 °C in air atmosphere. Accordingly, the layered SAW devices based on AlN thin films and 3C-SiC layers are applicable to timing and sensing applications in harsh environments.

  18. Effect of thermal annealing treatment with titanium chelate on buffer layer in inverted polymer solar cells

    NASA Astrophysics Data System (ADS)

    Liu, Zhiyong; Wang, Ning; Fu, Yan

    2016-12-01

    The solution processable electron extraction layer (EEL) is crucial for polymer solar cells (PSCs). Here, we investigated titanium (diisopropoxide) bis(2,4-pentanedionate) (TIPD) as an EEL and fabricated inverted PSCs with a blend of poly(3-hexylthiophene) (P3HT) and indene-C60 bisadduct (ICBA) acting as the photoactive layer, with a structure of ITO/TIPD/P3HT:ICBA/MoO3/Ag. After thermal annealing treatment at 150 °C for 15 min, the PSC performances increased from 3.85% to 6.84% and they achieve stable power conversion efficiency (PCE), with a similar PCE compared with TiO2 as an EEL by the vacuum evaporated method. Fourier transform infrared spectroscopy (FTIR) and ultraviolet photoelectron spectroscopy (UPS) confirmed that the TIPD decomposed and formed the Tidbnd O bond, and the energy level of the lowest unoccupied molecular orbital and the highest occupied molecular orbital increased. The space charge limited current (SCLC) measurements further confirmed the improvement in electron collection and the transport ability using TIPD as the EEL and thermal annealing.

  19. Simple O2 plasma-processed V2O5 as an anode buffer layer for high-performance polymer solar cells.

    PubMed

    Bao, Xichang; Zhu, Qianqian; Wang, Ting; Guo, Jing; Yang, Chunpeng; Yu, Donghong; Wang, Ning; Chen, Weichao; Yang, Renqiang

    2015-04-15

    A simple O2 plasma processing method for preparation of a vanadium oxide (V2O5) anode buffer layer on indium tin oxide (ITO)-coated glass for polymer solar cells (PSCs) is reported. The V2O5 layer with high transmittance and good electrical and interfacial properties was prepared by spin coating a vanadium(V) triisopropoxide oxide alcohol solution on ITO and then O2 plasma treatment for 10 min [V2O5 (O2 plasma)]. PSCs based on P3HT:PC61BM and PBDTTT-C:PC71BM using V2O5 (O2 plasma) as an anode buffer layer show high power conversion efficiencies (PCEs) of 4.47 and 7.54%, respectively, under the illumination of AM 1.5G (100 mW/cm(2)). Compared to that of the control device with PBDTTT-C:PC71BM as the active layer and PSS (PCE of 6.52%) and thermally annealed V2O5 (PCE of 6.27%) as the anode buffer layer, the PCE was improved by 15.6 and 20.2%, respectively, after the introduction of a V2O5 (O2 plasma) anode buffer layer. The improved PCE is ascribed to the greatly improved fill factor and enhanced short-circuit current density of the devices, which benefited from the change in the work function of V2O5, a surface with many dangling bonds for better interfacial contact, and the excellent charge transport property of the V2O5 (O2 plasma) layer. The results indicate that an O2 plasma-processed V2O5 film is an efficient and economical anode buffer layer for high-performance PSCs. It also provides an attractive choice for low-cost fabrication of organic electronics.

  20. Understanding Coulomb Scattering Mechanism in Monolayer MoS2 Channel in the Presence of h-BN Buffer Layer.

    PubMed

    Joo, Min-Kyu; Moon, Byoung Hee; Ji, Hyunjin; Han, Gang Hee; Kim, Hyun; Lee, Gwanmu; Lim, Seong Chu; Suh, Dongseok; Lee, Young Hee

    2017-02-08

    As the thickness becomes thinner, the importance of Coulomb scattering in two-dimensional layered materials increases because of the close proximity between channel and interfacial layer and the reduced screening effects. The Coulomb scattering in the channel is usually obscured mainly by the Schottky barrier at the contact in the noise measurements. Here, we report low-temperature (T) noise measurements to understand the Coulomb scattering mechanism in the MoS2 channel in the presence of h-BN buffer layer on the silicon dioxide (SiO2) insulating layer. One essential measure in the noise analysis is the Coulomb scattering parameter (αSC) which is different for channel materials and electron excess doping concentrations. This was extracted exclusively from a 4-probe method by eliminating the Schottky contact effect. We found that the presence of h-BN on SiO2 provides the suppression of αSC twice, the reduction of interfacial traps density by 100 times, and the lowered Schottky barrier noise by 50 times compared to those on SiO2 at T = 25 K. These improvements enable us to successfully identify the main noise source in the channel, which is the trapping-detrapping process at gate dielectrics rather than the charged impurities localized at the channel, as confirmed by fitting the noise features to the carrier number and correlated mobility fluctuation model. Further, the reduction in contact noise at low temperature in our system is attributed to inhomogeneous distributed Schottky barrier height distribution in the metal-MoS2 contact region.

  1. Improved performance of organic light-emitting diodes fabricated on Al-doped ZnO anodes incorporating a homogeneous Al-doped ZnO buffer layer grown by atomic layer deposition.

    PubMed

    Choi, Yong-June; Gong, Su Cheol; Park, Chang-Sun; Lee, Hong-Sub; Jang, Ji Geun; Chang, Ho Jung; Yeom, Geun Young; Park, Hyung-Ho

    2013-05-01

    In this work, we investigated the use of a homogeneous Al-doped zinc oxide (AZO) buffer layer to improve the performance of an organic light-emitting diode (OLED) device fabricated on an AZO anode. For this, 10-nm-thick AZO buffer layers with Al doping concentrations of 3.1, 4.1, and 5.1 at % were grown on 140-nm-thick AZO anode films containing 2.1 at % Al by atomic layer deposition. The electrical resistivity of the AZO anode with a homogeneous AZO buffer layer decreased with an increase in Al doping concentration up to 4.1 at %; however, the resistivity increased at higher doping concentrations in the AZO buffer layer. On the other hand, the work functions of the AZO anode with the AZO buffer layer containing various Al doping concentrations gradually increased with an increase in Al doping concentration from 3.1 to 5.1 at %. Therefore, the best film properties were obtained for an AZO anode with an AZO buffer layer containing 4.1 at % Al, and the work function value for this film was 4.64 eV. The highest luminance and current efficiency values were optimized to be 20290 cd/m(2) and 13.4 cd/A, respectively, with the OLED device composed of a DNTPD/TAPC/Bebq2:10% doped RP-411/Bphen/LiF/Al structure on an AZO anode with an AZO buffer layer containing 4.1 at % Al.

  2. Chemical solution deposition of textured BaTiO3 buffer layers on cube textured Ni-tapes fabricated from commercially available nickel

    NASA Astrophysics Data System (ADS)

    Staller, O.; Gritzner, G.

    2008-02-01

    Barium titanate buffer layers were successfully applied to cube textured Ni-tapes fabricated from commercially available nickel by a chemical solution deposition route. Barium acetate solutions in anhydrous acetic acid were mixed with bis(pentane-2,4-dionato)-titanium(IV)-oxide dissolved in methanol. A slight excess of acetic acid anhydride assured the anhydrous medium. The precursor solution was spin-coated to the Ni-substrate. Heat treatment at 1 000°C under a reducing atmosphere (Ar + 6.5 vol-% H2) resulted in dense c-axis oriented, a-b in-plane aligned buffer layers.

  3. Dataset representing the effect of indirect band gap region of Cd-free AlGaAs buffer layer in Cu(In,Ga)Se photovoltaic cell.

    PubMed

    Shachi, Sadia Islam; Bahar, Ali Newaz

    2017-10-01

    The dataset of physical properties for the proposed CIGS solar cell with Cd-free AlGaAs buffer layer has been depicted in this data article. The cell performance outcome due to different AlGaAs buffer layer band gap is reported along with optimum solar cell performance parameters for instance, open circuit voltage [Formula: see text], short circuit current density ([Formula: see text], fill factor [Formula: see text], efficiency [Formula: see text], as well as collection efficiency [Formula: see text].

  4. Effects of Varied Cleaning Methods on Ni-5% W Substrate for Dip-Coating of Water-based Buffer Layers: An X-ray Photoelectron Spectroscopy Study

    PubMed Central

    Narayanan, Vyshnavi; Bruneel, Els; Hühne, Ruben; van Driessche, Isabel

    2012-01-01

    This work describes various combinations of cleaning methods involved in the preparation of Ni-5% W substrates for the deposition of buffer layers using water-based solvents. The substrate has been studied for its surface properties using X-ray photoelectron spectroscopy (XPS). The contaminants in the substrates have been quantified and the appropriate cleaning method was chosen in terms of contaminants level and showing good surface crystallinity to further consider them for depositing chemical solution-based buffer layers for Y1Ba2Cu3Oy (YBCO) coated conductors.

  5. Improved efficiency of organic solar cells using Au NPs incorporated into PEDOT:PSS buffer layer

    NASA Astrophysics Data System (ADS)

    Otieno, Francis; Shumbula, Ndivhuwo P.; Airo, Mildred; Mbuso, Mlambo; Moloto, Nosipho; Erasmus, Rudolph M.; Quandt, Alexander; Wamwangi, Daniel

    2017-08-01

    Au based plasmonic phenomenon inside the hole transport layer poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate) (PEDOT:PSS) of an organic solar cell based on blend of poly(3-hexylthiophene) (P3HT) and [6:6]-phenyl-C61-butyric acid (PCBM) is investigated. The concentration of the Au nanoparticles synthesized by wet chemical reduction is one of the key factors to strong light trapping when the spherical gold nanoparticles are blended into the PEDOT:PSS solution. Studies of the influence of the concentration of nanoparticles distribution in the PEDOT:PSS were carried out using UV-Vis spectroscopy and atomic force microscopy. Electrical characteristics of the pristine device and of device with metallic nanostructures were analyzed from J -V characteristics to observe the plasmonic effects on the performance in the P3HT:PCBM organic solar cells. The origin of the photocurrent enhancements with varying Au nanoparticles concentrations on PEDOT:PSS are discussed.

  6. Growth of ZnO(0001) on GaN(0001)/4H-SiC buffer layers by plasma-assisted hybrid molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Adolph, David; Tingberg, Tobias; Ive, Tommy

    2015-09-01

    Plasma-assisted molecular beam epitaxy was used to grow ZnO(0001) layers on GaN(0001)/4H-SiC buffer layers deposited in the same growth chamber equipped with both N- and O-plasma sources. The GaN buffer layers were grown immediately before initiating the growth of ZnO. Using a substrate temperature of 445 °C and an O2 flow rate of 2.5 standard cubic centimeters per minute, we obtained ZnO layers with statistically smooth surfaces having a root-mean-square roughness of 0.3 nm and a peak-to-valley distance of 3 nm as revealed by atomic force microscopy. The full-width-at-half-maximum for x-ray rocking curves obtained across the ZnO(0002) and ZnO(10 1 bar 5) reflections was 198 and 948 arcsec, respectively. These values indicated that the mosaicity of the ZnO layer was comparable to the corresponding values of the underlying GaN buffer layer. Reciprocal space maps showed that the in-plane relaxation of the GaN and ZnO layers was 82% and 73%, respectively, and that the relaxation occurred abruptly during the growth. Room-temperature Hall-effect measurements revealed that the layers were inherently n-type and had an electron concentration of 1×1019 cm-3 and a Hall mobility of 51 cm2/V s.

  7. Nearly 4-Inch-Diameter Free-Standing GaN Wafer Fabricated by Hydride Vapor Phase Epitaxy with Pit-Inducing Buffer Layer

    NASA Astrophysics Data System (ADS)

    Sato, Tadashige; Okano, Shinya; Goto, Takenari; Yao, Takafumi; Seto, Ritsu; Sato, Akira; Goto, Hideki

    2013-08-01

    A free-standing GaN wafer was fabricated by depositing a GaN buffer that induced the formation of pits (hereafter, pit-inducing GaN buffer) on a low-temperature-grown GaN buffer on the sapphire substrate. A high-temperature-grown GaN layer was grown on the pit-inducing GaN buffer that induced the formation of pits on the high-temperature-grown GaN layer. The pit-inducing buffer suppresses crack formation in the thick GaN film thereby releasing growth stress. Thermal stress in GaN on a sapphire system is also discussed on the basis of calculations utilizing a bilayer model. We have succeeded in the fabrication of a nearly 4-in.-diameter free-standing GaN thick wafer with a pit-inducing GaN buffer by one-stop hydride vapor phase epitaxy, which will lead to a low-cost fabrication of free-standing GaN wafers.

  8. Improved hole-injection and power efficiency of organic light-emitting diodes using an ultrathin cerium fluoride buffer layer

    NASA Astrophysics Data System (ADS)

    Lu, Hsin-Wei; Kao, Po-Ching; Chu, Sheng-Yuan

    2016-09-01

    In this study, the efficiency of organic light-emitting diodes (OLEDs) was enhanced by depositing a CeF3 film as an ultra-thin buffer layer between the ITO and NPB hole transport layer, with the structure configuration ITO/CeF3 (1 nm)/NPB (40 nm)/Alq3 (60 nm)/LiF (1 nm)/Al (150 nm). The enhancement mechanism was systematically investigated via several approaches. The work function increased from 4.8 eV (standard ITO electrode) to 5.2 eV (1-nm-thick UV-ozone treated CeF3 film deposited on the ITO electrode). The turn-on voltage decreased from 4.2 V to 4.0 V at 1 mA/cm2, the luminance increased from 7588 cd/m2 to 10820 cd/m2, and the current efficiency increased from 3.2 cd/A to 3.5 cd/A when the 1-nm-thick UV-ozone treated CeF3 film was inserted into the OLEDs.

  9. Thin-film encapsulation of organic electronic devices based on vacuum evaporated lithium fluoride as protective buffer layer

    NASA Astrophysics Data System (ADS)

    Peng, Yingquan; Ding, Sihan; Wen, Zhanwei; Xu, Sunan; Lv, Wenli; Xu, Ziqiang; Yang, Yuhuan; Wang, Ying; Wei, Yi; Tang, Ying

    2017-03-01

    Encapsulation is indispensable for organic thin-film electronic devices to ensure reliable operation and long-term stability. For thin-film encapsulating organic electronic devices, insulating polymers and inorganic metal oxides thin films are widely used. However, spin-coating of insulating polymers directly on organic electronic devices may destroy or introduce unwanted impurities in the underlying organic active layers. And also, sputtering of inorganic metal oxides may damage the underlying organic semiconductors. Here, we demonstrated that by utilizing vacuum evaporated lithium fluoride (LiF) as protective buffer layer, spin-coated insulating polymer polyvinyl alcohol (PVA), and sputtered inorganic material Er2O3, can be successfully applied for thin film encapsulation of copper phthalocyanine (CuPc)-based organic diodes. By encapsulating with LiF/PVA/LiF trilayer and LiF/Er2O3 bilayer films, the device lifetime improvements of 10 and 15 times can be achieved. These methods should be applicable for thin-film encapsulation of all kinds of organic electronic devices. Moisture-induced hole trapping, and Al top electrode oxidation are suggest to be the origins of current decay for the LiF/PVA/LiF trilayer and LiF/Er2O3 bilayer films encapsulated devices, respectively.

  10. The Electronic Properties of AlN Tunnel Barriers and the Effect of Oxygen Impurities

    NASA Astrophysics Data System (ADS)

    Li, Yun; Read, John; Huang, Pinshane; Tseng, Hsin-Wei; Buhrman, Robert

    2009-03-01

    The use of ultra-thin aluminum nitride (AlN) barrier layers can result in Josephson Junctions (JJ's) with both very high critical current densities and low sub-gap leakage [1-4], demonstrating that AlN is a superior JJ tunnel barrier material in the ultra-thin barrier limit. We have utilized scanning tunneling spectroscopy (STS) and analytical scanning transmission electron microscopy (STEM) with electron energy-loss spectroscopy (EELS) to investigate thin AlN layers formed on Nb/Al bilayers by treating the Al surface with an atomic nitrogen beam. Under optimum nitridation conditions the resultant ˜1nm AlN barrier layers have small, ˜ 1 eV, but well defined band gaps and stable surfaces in UHV, with the absence of band-tail states extending close to the Fermi energy, which is in sharp contrast to the case for AlOx layers formed by thermal oxidation [5]. The AlN barrier layers are however quite sensitive to even low levels of background oxygen (O) exposure, either during or after the nitridation process, which reacts O into the barrier layer and results in the formation of low energy band-tail states and an unstable surface. [1] Zijlstra et al., APL 91, 233102 (2007); [2] Wang et al., APL 64, 2034 (1994); [3] Kleinsasser et al., IEEE TAS 5, 2318 (1995); [4] Kaul et al., JMRS 20, 3047 (2005); [5] Mather et al., APL 86, 242504 (2005)

  11. Direct charge carrier injection into Ga2O3 thin films using an In2O3 cathode buffer layer: their optical, electrical and surface state properties

    NASA Astrophysics Data System (ADS)

    Cui, W.; Zhao, X. L.; An, Y. H.; Guo, D. Y.; Qing, X. Y.; Wu, Z. P.; Li, P. G.; Li, L. H.; Cui, C.; Tang, W. H.

    2017-04-01

    Conductive Ga2O3 thin films with an In2O3 buffer layer have been prepared on c-plane sapphire substrates using a laser molecular beam epitaxy technique. The effects of the In2O3 buffer layer on the structure and optical, electrical and surface state properties of the Ga2O3 films have been studied. The change in conductivity of the thin films is attributed to different thicknesses of the In2O3 buffer layer, which determine the concentration of charge carriers injected into the upper Ga2O3 layer from the interface of the bilayer thin films. In addition, the increase in flat band voltage shift and capacitance values as the In2O3 buffer layer thickens are attributed to the increase in surface state density, which also contributes to the rapid shrinkage of the optical band gap of the Ga2O3. With transparency to visible light, high n-type conduction and the ability to tune the optical band gap and surface state density, we propose that Ga2O3/In2O3 bilayer thin film is an ideal n-type semiconductor for fabrication of transparent power devices, solar cell electrodes and gas sensors.

  12. Investigation of CdZnS Buffer Layers on the Performance of CuInGaSe2 and CuGaSe2 Solar Cells

    SciTech Connect

    Song, J.; Li, S. S.; Chen, L.; Noufi, R.; Anderson, T. J.; Crisalle, O. D.

    2006-01-01

    Cu(In,Ga)Se{sub 2} (CIGS) and CuGaSe{sub 2} (CGS) solar cells were fabricated using Cd{sub 1-x}Zn{sub x}S (CdZnS) buffer layers prepared by chemical bath deposition (CBD) with relative Zn compositions in the CBD bath values of X{sub bath} = 0 (i.e., pure CdS), 0.1, 0.2, 0.3, 0.4, and 0.5. The cell performance parameters of CIGS and CGS films treated with a KCN solution were investigated and compared to cells without KCN treatment. It was found that absorber films treated with KCN etching prior to the buffer CBD step show an improved cell performance for both the CIGS and CGS cells deposited with either CdS or CdZnS buffer layer. A CIGS cell with CdZnS buffer layer of X{sub bath} = 0.2 produced a 13% AM1.5G conversion efficiency with higher V{sub oc}, J{sub sc}, and FF values as compared to the CdZnS/CIGS cells with different Zn contents. Results of photo- J-V and quantum efficiency (QE) measurements reveal that the CGS cell with CdZnS buffer layer of X{sub bath} = 0.3 performed better than the CGS cell deposited with a pure CdS buffer layer. This result is suggested as a result of an increased photocurrent at shorter wavelengths and a more favorable conduction band-offset at the CdZnS/CGS junction.

  13. Long wavelength emitting GaInN quantum wells on metamorphic GaInN buffer layers with enlarged in-plane lattice parameter

    SciTech Connect

    Däubler, J. Passow, T.; Aidam, R.; Köhler, K.; Kirste, L.; Kunzer, M.; Wagner, J.

    2014-09-15

    Metamorphic (i.e., linear composition graded) GaInN buffer layers with an increased in-plane lattice parameter, grown by plasma-assisted molecular beam epitaxy, were used as templates for metal organic vapor phase epitaxy (MOVPE) grown GaInN/GaInN quantum wells (QWs), emitting in the green to red spectral region. A composition pulling effect was observed allowing considerable higher growth temperatures for the QWs for a given In composition. The internal quantum efficiency (IQE) of the QWs was determined by temperature and excitation power density dependent photoluminescence (PL) spectroscopy. An increase in IQE by a factor of two was found for green emitting QWs grown on metamorphic GaInN buffer compared to reference samples grown on standard GaN buffer layers. The ratio of room temperature to low temperature intensity PL of the red emitting QWs were found to be comparable to the PL efficiency of green emitting QWs, both grown on metamorphic GaInN buffers. The excitation density and well width dependence of the IQE indicate a reduction of the quantum confined Stark effect upon growth on GaInN buffer layers with increased in-plane lattice parameter.

  14. Density functional theory study of the adsorption and incorporation of Sc and Y on the AlN(0001) surface

    NASA Astrophysics Data System (ADS)

    González-Hernández, Rafael; González-Garcia, Alvaro; López-Perez, William

    2016-06-01

    Density functional theory (DFT) calculations were carried out in order to study the adsorption and incorporation of scandium and yttrium atoms on the AlN(0001) surface aiming to gain insight into epitaxial growth of ScxAl1-x N and YxAl1-x N layers on AlN. The adsorption energy, geometry, formation energy, band structure and density of states of Sc (and Y) adatom/AlN(0001) systems are calculated. The calculations showed that the interaction between Sc (and Y) adatom and the AlN(0001) surface is strong (~ 3.9 eV) and it prefers to adsorb on N-top site (T4). However, formation energy calculations reveal that the incorporation of Sc and Y atoms in the Al-substitutional site is energetically more favorable compared with the adsorption on the top layers, which can be attributed to the lower enthalpy of formation of ScN and YN with respect to that of AlN. The results also suggest that the Sc and Y atoms prefer to incorporate in top AlN surface layers. At full coverage, calculations show the formation of metallic ScxN and YxAl1-x N layers on the AlN polar surface over the entire range of Al chemical potentials, in agreement with experimental observations. In addition, we found that for high coverage Sc atoms couple ferromagnetically in the Al-substitutional sites on the AlN(0001) surface.

  15. EXAMINATION OF DISLOCATIONS IN LATTICE-MISMATCHED GaInAs/BUFFER LAYER/GaAs FOR III-V PHOTOVOLTAICS

    SciTech Connect

    Levander, A.; Geisz, J.

    2007-01-01

    Dislocations act as sites for nonradiative electron/hole pair recombination, which reduces the effi ciency of photovoltaics. Lattice-matched materials can be grown on top of one another without forming a high density of dislocations. However, when the growth of lattice-mismatched (LMM) materials is attempted, many dislocations result from the relaxation of strain in the crystal structure. In an attempt to reduce the number of dislocations that propagate into a solar device when using LMM materials, a compositionally step-graded buffer is placed between the two LMM materials. In order to confi ne the dislocations to the buffer layer and therefore increase material quality and device effi ciency, the growth temperature and thickness of the buffer layer were varied. A GaInP compositionally graded buffer and GaInAs p-n junction were grown on a GaAs substrate in a metal-organic chemical vapor deposition (MOCVD) system. A multibeam optical stress sensor (MOSS) and X-ray diffraction (XRD) were used to characterize the strain in the epilayers. Electrical and optoelectronic properties were measured using a probe station and multimeter setup, solar simulator, and a quantum effi ciency instrument. It was determined that device functionality was highly dependent on the growth temperature of the graded buffer. As growth temperature increased, so did the dislocation density in the device despite an increase in the dislocation velocity, which should have increased the dislocation annihilation rate and the diffusion of dislocations to the edge of the crystal. The thickness of the graded buffer also affected device effi ciency with thinner samples performing poorly. The thinner graded buffer layers had high internal resistances from reduced carrier concentrations. In terms of effi ciency, the empirically derived recipe developed by the scientists at the National Renewable Energy Laboratory (NREL) produced the highest quality cells.

  16. Synthesis of c-axis oriented AlN thin films on different substrates: A review

    SciTech Connect

    Iriarte, G.F.

    2010-09-15

    Highly c-axis oriented AlN thin films have been deposited by reactive sputtering on different substrates. The crystallographic properties of layered film structures consisting of a piezoelectric layer, aluminum nitride (AlN), synthesized on a variety of substrates, have been examined. Aluminum nitride thin films have been deposited by reactive pulsed-DC magnetron sputtering using an aluminum target in an Ar/N{sub 2} gas mixture. The influence of the most critical deposition parameters on the AlN thin film crystallography has been investigated by means of X-ray diffraction (XRD) analysis of the rocking curve Full-Width at Half Maximum (FWHM) of the AlN-(0 0 0 2) peak. The relationship between the substrate, the synthesis parameters and the crystallographic orientation of the AlN thin films is discussed. A guide is provided showing how to optimize these conditions to obtain highly c-axis oriented AlN thin films on substrates of different nature.

  17. High Cubic-Phase Purity InN on MgO (001) Using Cubic-Phase GaN as a Buffer Layer

    SciTech Connect

    Sanorpim, S.; Kuntharin, S.; Parinyataramas, J.; Yaguchi, H.; Iwahashi, Y.; Orihara, M.; Hijikata, Y.; Yoshida, S.

    2011-12-23

    High cubic-phase purity InN films were grown on MgO (001) substrates by molecular beam epitaxy with a cubic-phase GaN buffer layer. The cubic phase purity of the InN grown layers has been analyzed by high resolution X-ray diffraction, {mu}-Raman scattering and transmission electron microscopy. It is evidenced that the hexagonal-phase content in the InN overlayer much depends on hexagonal-phase content in the cubic-phase GaN buffer layer and increases with increasing the hexagonal-phase GaN content. From Raman scattering measurements, in addition, the InN layer with lowest hexagonal component (6%), only Raman characteristics of cubic TO{sub InN} and LO{sub InN} modes were observed, indicating a formation of a small amount of stacking faults, which does not affect on vibrational property.

  18. Experimental Investigation on Thermoresistance between AlN, Bi-2223 and OFHC in High Tc- Direct Cooling Technology

    NASA Astrophysics Data System (ADS)

    Wang, H. L.; Rao, R. S.; Wang, J.

    2014-12-01

    In the development of high temperature superconducting (HTS) direct cooling technology, the high electric insulation high heat conducting AlN has become one of the important components. The thermal contact resistance between AlN, Bi-2223 and OFHC is investigated by experiment with a G-M cryocooler as the source of cooling. The heat conductivity of AlN is measured between 29 and 160 K temperatures. When the temperature on the interface layer side of Bi-2223 is 55 K, under the action of the contact pressure of 0.5469 MPa, the thermal contact resistance between AlN and Bi-2223 is 38.86 times to the thermal conduction resistance of a 10 mm thick AlN pad. Baced on micro-nanocryogenics, it is proposed that the thermal contact resistance is one of the crucial techniques to be attacked in HTS direct cooling technology.

  19. Improvement of Performance and Stability of Polymer Photovoltaic Cells by WO3/CUPC as Anode Buffer Layers

    NASA Astrophysics Data System (ADS)

    Varnamkhasti, M. G.; Shahriaria, E.

    2015-05-01

    In this work, bulk-hetrojunction polymer photovoltaic cells based on poly-(3-hexylthiophene) (P3HT): [6,6]-phenyl C61 butyric acid methyl ester (PCBM) were fabricated with tungsten oxide (WO3) and copper phthalocyanine (CuPc) as anodic buffer layers. The WO3 plays an important role in reducing the interfacial resistance, efficiently extracting holes and good band structure matching between the work function of the anode and the highest occupied molecular orbital of the organic material. The insertion of CuPc improves the device In this work, bulk-hetrojunction polymer photovoltaic cells based on poly-(3-hexylthiophene) (P3HT): [6, 6]-phenyl C61 butyric acid methylester (PCBM) were fabricated with tungsten oxide (WO3) and copper phthalocyanine (CuPc) as anodic buffer layers. The WO3 plays animportant role in reducing the interfacial resistance, efficiently extracting holes and good band structure matching between the workfunction of the anode and the highest occupied molecular orbital of the organic material. The insertion of CuPc improves the device performance and expands the absorption spectra range of the photovoltaic devices. The effects of WO3 and CuPc thickness on the performance of the photovoltaic devices were investigated. The optimum thicknesses of WO3 and CuPc were 10 nm and 8 nm, respectively. The obtained power conversion efficiency of optimized cell was about 4.21%. Also, the device performance was analyzed based on thesurface roughness of bare ITO and ITO that was covered with poly (3, 4-ethylenedioxythiophene): poly (styrene sulfonate) (PEDOT:PSS) or WO3/CuPc. The device stability in an ambient atmosphere without encapsulation under continuous light irradiation was also investigated.For the cell with PEDOT:PSS, the power conversion efficiency reduced down to 50% of the maximum value (half-life) after light irradiation for 12 h, while the half-life of device for WO3/CuPc was about 120 h. Therefore, the lifetime of unpackaged devices was improved with

  20. Effect of InSb/In0.9Al0.1Sb superlattice buffer layer on the structural and electronic properties of InSb films

    NASA Astrophysics Data System (ADS)

    Zhao, Xiaomeng; Zhang, Yang; Guan, Min; Cui, Lijie; Wang, Baoqiang; Zhu, Zhanping; Zeng, Yiping

    2017-07-01

    The effect of InSb/In0.9Al0.1Sb buffer layers on InSb thin films grown on GaAs (0 0 1) substrate by molecular beam epitaxy (MBE) is investigated. The crystal quality and the surface morphology of InSb are characterized by XRD and AFM. The carrier transport property is researched through variable temperature hall test. The sharp interface between InSb/In0.9Al0.1Sb is demonstrated important for the high quality InSb thin film. We try different superlattice buffer layers by changing ratios, 2-0.5, thickness, 300-450 nm, and periods, 20-50. According to the function of the dislocation density to the absolute temperature below 150 K with different periods of SL buffers, we can find that the number of periods of superlattice is a major factor to decrease the density of threading dislocations. With the 50 periods SL buffer layer, the electron mobility of InSb at the room temperature and liquid nitrogen cooling temperature is ∼63,000 and ∼4600 cm2/V s, respectively. We deduce that the interface in the SL structure works as a filter layer to prevent the dislocation propagating to the upper InSb thin films.

  1. Mechanism insight into the effect of I/P buffer layer on the performance of NIP-type hydrogenated microcrystalline silicon solar cells

    NASA Astrophysics Data System (ADS)

    Bai, Lisha; Liu, Bofei; Zhao, Jing; Suo, Song; Hou, Guofu; Zhang, Dekun; Sun, Jian; Wei, Changchun; Zhao, Ying; Zhang, Xiaodan

    2015-05-01

    A simulation and experimental study on the effect of the buffer layer at the I/P interface on the performance of NIP-type hydrogenated microcrystalline silicon (μc-Si:H) single-junction solar cells is presented. Device-quality hydrogenated amorphous silicon (a-Si:H) material as a buffer layer at the I/P interface obviously improves the performance of NIP-type μc-Si:H single-junction solar cells. In addition to the well-known mechanism that an a-Si:H I/P buffer layer can reduce the recombination current density at I/P interfaces, the optically and electrically calibrated simulations and supporting experimental results in this study illustrate that the performance improvement also originates from the mitigation of the electric screening effect due to the reduced defect density at the I/P interfaces, which reinforces the bulk electric field. Integrating an optimized hydrogen profiling strategy and adding a-Si:H I/P buffer layer yielded an initial efficiency of 9.20% for μc-Si:H single-junction solar cells with an active area of 0.27 cm2. This study may provide new ideas of further improving the performance of NIP-type μc-Si:H single-junction solar cells by mitigating the electric screening effect.

  2. Effect of impurities in the CdS buffer layer on the performance of the Cu(In, Ga)Se2 thin film solar cell

    NASA Astrophysics Data System (ADS)

    Kylner, A.

    1999-05-01

    The highest efficiencies of Cu(In, Ga)Se2 (CIGS) thin film solar cells have been achieved when incorporating a thin CdS buffer layer grown by chemical bath deposition (CBD). The reason for this success has recently been discussed in terms of a pure Cd-doping effect in the CIGS layer. Such a model suggests that the bulk properties of the CBD-CdS buffer layer would be of minor importance. In this work, CBD-CdS layers having different bulk properties (i.e., concentrations of incorporated impurities) were employed in a number of CIGS solar cells. To further explore the bulk versus interface properties, half of these CIGS devices were subjected to a pre-deposition of an additional intermediate ultrathin layer. Moreover, CIGS devices made with CBD-CdS layers of different thickness were fabricated. Both standard and temperature dependent current-voltage (I-V) measurements were performed. The results indicate that the bulk properties of the CBD-CdS buffer layer indeed play an important role in the formation of the CdS/CIGS heterojunction. By increasing the impurity concentration or the thickness of the CBD-CdS layer, the open-circuit voltage Voc was observed to substantially increase. This favorable effect was counteracted by the appearance of a crossover effect in the I-V characteristics for devices with the highest impurity concentration or thickness of the CBD-CdS layer. The pre-deposition of an ultrathin layer did not affect these results. The presence of the crossover effect was strongly correlated to the appearance of trap-assisted tunneling in addition to the thermally assisted tunneling. The observed crossover effect was suggested to originate from too high a number of impurities (defect states) in the bulk of the CdS layer.

  3. Power Conversion Efficiency and Device Stability Improvement of Inverted Perovskite Solar Cells by Using a ZnO:PFN Composite Cathode Buffer Layer.

    PubMed

    Jia, Xiaorui; Zhang, Lianping; Luo, Qun; Lu, Hui; Li, Xueyuan; Xie, Zhongzhi; Yang, Yongzhen; Li, Yan-Qing; Liu, Xuguang; Ma, Chang-Qi

    2016-07-20

    We have demonstrated in this article that both power conversion efficiency (PCE) and performance stability of inverted planar heterojunction perovskite solar cells can be improved by using a ZnO:PFN nanocomposite (PFN: poly[(9,9-bis(3'-(N,N-dimethylamion)propyl)-2,7-fluorene)-alt-2,7-(9,9-dioctyl)-fluorene]) as the cathode buffer layer (CBL). This nanocomposite could form a compact and defect-less CBL film on the perovskite/PC61BM surface (PC61BM: phenyl-C61-butyric acid methyl ester). In addition, the high conductivity of the nanocomposite layer makes it works well at a layer thickness of 150 nm. Both advantages of the composite layer are helpful in reducing interface charge recombination and improving device performance. The power conversion efficiency (PCE) of the best ZnO:PFN CBL based device was measured to be 12.76%, which is higher than that of device without CBL (9.00%), or device with ZnO (7.93%) or PFN (11.30%) as the cathode buffer layer. In addition, the long-term stability is improved by using ZnO:PFN composite cathode buffer layer when compare to that of the reference cells. Almost no degradation of open circuit voltage (VOC) and fill factor (FF) was found for the device having ZnO:PFN, suggesting that ZnO:PFN is able to stabilize the interface property and consequently improve the solar cell performance stability.

  4. Hydrothermal Growth and Application of ZnO Nanowire Films with ZnO and TiO2 Buffer Layers in Dye-Sensitized Solar Cells

    NASA Astrophysics Data System (ADS)

    Yang, Weiguang; Wan, Farong; Chen, Siwei; Jiang, Chunhua

    2009-12-01

    This paper reports the effects of the seed layers prepared by spin-coating and dip-coating methods on the morphology and density of ZnO nanowire arrays, thus on the performance of ZnO nanowire-based dye-sensitized solar cells (DSSCs). The nanowire films with the thick ZnO buffer layer (~0.8-1 μm thick) can improve the open circuit voltage of the DSSCs through suppressing carrier recombination, however, and cause the decrease of dye loading absorbed on ZnO nanowires. In order to further investigate the effect of TiO2 buffer layer on the performance of ZnO nanowire-based DSSCs, compared with the ZnO nanowire-based DSSCs without a compact TiO2 buffer layer, the photovoltaic conversion efficiency and open circuit voltage of the ZnO DSSCs with the compact TiO2 layer (~50 nm thick) were improved by 3.9-12.5 and 2.4-41.7%, respectively. This can be attributed to the introduction of the compact TiO2 layer prepared by sputtering method, which effectively suppressed carrier recombination occurring across both the film-electrolyte interface and the substrate-electrolyte interface.

  5. Improvement of photovoltaic efficiency of dye-sensitized solar cell by introducing highly transparent nanoporous TiO2 buffer layer.

    PubMed

    Kim, Yong Joo; Kim, Hark Jin; Lee, Mi Hyeon; Lim, Goo Il; Song, Hye Young; Choi, Young Sik; Park, Nam-Gyu; Lee, Chongmu; Lee, Wan In

    2010-01-01

    13 nm-sized highly-dispersible TiO2 nanoparticle was synthesized by solvothermal reaction of titanium isopropoxide in a basic condition with tetrabutylammonium hydroxide (TBAH). The prepared TiO2 nanoparticle was applied to fabrication of the transparent nanoporous TiO2 layer with 1.2 microm-thickness. By introducing this buffer layer between FTO and main TiO2 layer in the dye-sensitized solar cell (DSSC), the photovoltaic conversion efficiency was improved from 5.92% to 7.13%. Due to the excellent antireflective role of nanoporous TiO2 buffer layer, the transmittance of FTO glass was increased by 9.2%, and this seemed to be one of the major factors in enhancing photovoltaic conversion efficiency. Moreover, the presence of nanoporous TiO2 buffer layer induces excellent adhesion between FTO and main TiO2 layer, as well as it suppresses the back reaction by blocking direct contact between I3- and FTO electrode.

  6. Application of biuret, dicyandiamide, or urea as a cathode buffer layer toward the efficiency enhancement of polymer solar cells.

    PubMed

    Zhao, Xuemei; Xu, Chenhui; Wang, Haitao; Chen, Fei; Zhang, Wenfeng; Zhao, Zhiqiang; Chen, Liwei; Yang, Shangfeng

    2014-03-26

    Three amino-containing small-molecule organic materials-biuret, dicyandiamide (DCDA), and urea-were successfully applied as novel cathode buffer layers (CBLs) in P3HT:PCBM bulk heterojunction polymer solar cells (BHJ-PSCs) for the first time, resulting in obvious efficiency enhancement. Under the optimized condition, the power conversion efficiencies (PCEs) of the CBL-incorporated BHJ-PSC devices are 3.84%, 4.25%, and 4.39% for biuret, DCDA, and urea, which are enhanced by ∼15%, ∼27%, and ∼31%, respectively, compared to the reference poly(3-hexylthiophene-2,5-diyl) : [6,6]-phenyl-C61-butyric acid methyl ester (P3HT:PCBM) BHJ-PSC device without any CBL. The efficiency enhancement is primarily attributed to the increases of both short-circuit current density (Jsc) and fill factor (FF), for which the enhancement ratio is found to be sensitively dependent on the molecular structure of small-molecule organic materials. The surface morphologies and surface potential changes of the CBL-incorporated P3HT:PCBM photoactive layers were studied by atomic force microscopy and scanning Kelvin probe microscopy, respectively, suggesting the formation of an interfacial dipole layer between the photoactive layer and Al cathode, which may decrease the energy level offset between the work function of Al and the lowest unoccipoed molecular orbital level (LUMO) of the PCBM acceptor and consequently facilitate electron extraction by the Al cathode. The difference in the enhancement effect of biuret, DCDA, and urea is due to their difference on the work function matching with P3HT:PCBM. Besides, the coordination interaction between the lone-pair electrons on the N atoms of the amino (-NH2) group and the Al atoms may prohibit interaction between Al and the thiophene rings of P3HT, contributing to the efficiency enhancement of the CBL-incorporated devices as well. In this sense, the different CBL performance of biuret, DCDA, and urea is also proposed to partially originate from the

  7. Chemiluminescence flow biosensor for glucose using Mg-Al carbonate layered double hydroxides as catalysts and buffer solutions.

    PubMed

    Wang, Zhihua; Liu, Fang; Lu, Chao

    2012-01-01

    In this work, serving as supports in immobilizing luminol reagent, catalysts of luminol chemiluminescence (CL), and buffer solutions for the CL reaction, Mg-Al-CO(3) layered double hydroxides (LDHs) were found to trigger luminol CL in weak acid solutions (pH 5.8). The silica sol-gel with glucose oxidase and horseradish peroxidase was immobilized in the first half of the inside surface of a clear quartz tube, and luminol-hybrid Mg-Al-CO(3) LDHs were packed in the second half. Therefore, a novel CL flow-through biosensor for glucose was constructed in weak acid solutions. The CL intensity was linear with glucose concentration in the range of 0.005-1.0mM, and the detection limit for glucose (S/N=3) was 0.1 μM. The proposed biosensor exhibited excellent stability, high reproducibility and high selectivity for the determination of glucose and has been successfully applied to determine glucose in human plasma samples with satisfactory results. The success of this work has broken the bottleneck of the pH incompatibility between luminol CL and enzyme activity.

  8. Theoretical and experimental study of highly textured GaAs on silicon using a graphene buffer layer

    SciTech Connect

    Alaskar, Yazeed; Arafin, Shamsul; Lin, Qiyin; Wickramaratne, Darshana; McKay, Jeff; Norman, Andrew G.; Zhang, Zhi; Yao, Luchi; Ding, Feng; Zou, Jin; Goorsky, Mark S.; Lake, Roger K.; Zurbuchen, Mark A.; Wang, Kang L.

    2015-09-01

    A novel heteroepitaxial growth technique, quasi-van der Waals epitaxy, promises the ability to deposit three-dimensional GaAs materials on silicon using two-dimensional graphene as a buffer layer by overcoming the lattice and thermal expansion mismatch. In this study, density functional theory (DFT) simulations were performed to understand the interactions at the GaAs/graphene hetero-interface as well as the growth orientations of GaAs on graphene. To develop a better understanding of the molecular beam epitaxy-grown GaAs films on graphene, samples were characterized by x-ray diffraction (..theta..-2..theta.. scan, ..omega..-scan, grazing incidence XRD and pole figure measurement) and transmission electron microscopy. The realizations of smooth GaAs films with a strong (111) oriented fiber-texture on graphene/silicon using this deposition technique are a milestone towards an eventual demonstration of the epitaxial growth of GaAs on silicon, which is necessary for integrated photonics application.

  9. Epitaxial growth of superconducting MgB2 thin films with a Mg buffer layer at 110 °C

    NASA Astrophysics Data System (ADS)

    Shishido, Hiroaki; Nakagami, Takatoshi; Yoshida, Takuya; Ishida, Takekazu

    2017-07-01

    Since the discovery of MgB2, its application to superconducting electronics has been limited by the absent of proper microfabrication techniques. In this study, we grew crystalline MgB2 thin films using molecular beam epitaxy at a low substrate temperature of 110 °C under ultra-high vacuum of about 10-6 Pa. MgB2 thin films were deposited with an epitaxial Mg buffer layer on c-plane 4H-SiC or sapphire substrates. In spite of the low growth temperature, superior crystallinity and surface flatness were confirmed by in situ reflection high-energy electron diffraction and X-ray diffraction measurements. Moreover, we successfully confirmed the occurrence of a sharp superconducting transition at 27 K. The present growth temperature was lower than any in prior reports on superconducting MgB2 thin films, and is lower than the applicable temperature of an organic-based lift-off resist. Our new MgB2 thin film growth process is promising for the development of an alternative nanofabrication technique for MgB2 thin films by means of a standard lift-off process with an organic resist.

  10. Characterization of Zn(O,S) Buffer Layers for Cu(In,Ga)Se2 Solar Cells.

    PubMed

    Choi, Ji Hyun; Jung, Sung Hee; Chung, Chee Won

    2016-05-01

    Zn(O,S) thin films were deposited using a ZnS target under Ar/O2 gases by radio-frequency magnetron sputtering. As the O2 concentration increased, the deposition rates of the Zn(O,S) films decreased due to increase of O-. The crystalline structure of Zn(O,S) was maintained at up to 0.6% O2, while the films became unstable at the condition exceeding 0.8% O2. This was attributed to incomplete nucleation and film growth on the substrate at the room temperature. Additionally, optical emission spectroscopy analysis indicated that an increased O- intensity at high O2 concentration was responsible for the slow deposition rate and increased oxygen concentration of the films. X-ray diffraction and scanning electron microscopy revealed the formation of a Zn(O,S) crystal structure with partial substitution of O for S and uniform and dense grains of the films. X-ray photoelectron spectroscopy showed that the Zn(O,S) films have a uniform composition of each element and consisted of a mixed crystal structure of Zn(O,S) with Zn-O bonding. Overall, the results of this study confirmed that Zn(O,S) films deposited by radio-frequency sputtering using Ar/O2 gas at room temperature can be applied to Cu(In,Ga)Se2 solar cells as a buffer layer.

  11. Barrier efficiency of sponge-like La2Zr2O7 buffer layers for YBCO-coated conductors

    NASA Astrophysics Data System (ADS)

    Molina, Leopoldo; Tan, Haiyan; Biermans, Ellen; Batenburg, Kees J.; Verbeeck, Jo; Bals, Sara; Van Tendeloo, Gustaaf

    2011-06-01

    Solution derived La2Zr2O7 films have drawn much attention for potential applications as thermal barriers or low-cost buffer layers for coated conductor technology. Annealing and coating parameters strongly affect the microstructure of La2Zr2O7, but different film processing methods can yield similar microstructural features such as nanovoids and nanometer-sized La2Zr2O7 grains. Nanoporosity is a typical feature found in such films and the implications for the functionality of the films are investigated by a combination of scanning transmission electron microscopy (STEM), electron energy-loss spectroscopy (EELS) and quantitative electron tomography. Chemical solution based La2Zr2O7 films deposited on flexible Ni-5 at.%W substrates with a {100}lang001rang biaxial texture were prepared for an in-depth characterization. A sponge-like structure composed of nanometer-sized voids is revealed by high-angle annular dark-field scanning transmission electron microscopy in combination with electron tomography. A three-dimensional quantification of nanovoids in the La2Zr2O7 film is obtained on a local scale. Mostly non-interconnected highly faceted nanovoids compromise more than one-fifth of the investigated sample volume. The diffusion barrier efficiency of a 170 nm thick La2Zr2O7 film is investigated by STEM-EELS, yielding a 1.8 ± 0.2 nm oxide layer beyond which no significant nickel diffusion can be detected and intermixing is observed. This is of particular significance for the functionality of YBa2Cu3O7 - δ coated conductor architectures based on solution derived La2Zr2O7 films as diffusion barriers.

  12. Characterization of ZrO2 buffer layers for sequentially evaporated Y-Ba-CuO on Si and Al2O3 substrates

    NASA Technical Reports Server (NTRS)

    Valco, George J.; Rohrer, Norman J.; Pouch, John J.; Warner, Joseph D.; Bhasin, Kul B.

    1988-01-01

    Thin film high temperature superconductors have the potential to change the microwave technology for space communications systems. For such applications it is desirable that the films be formed on substrates such as Al2O3 which have good microwave properties. The use of ZrO2 buffer layers between Y-Ba-Cu-O and the substrate has been investigated. These superconducting films have been formed by multilayer sequential electron beam evaporation of Cu, BaF2 and Y with subsequent annealing. The three layer sequence of Y/BaF2/Cu is repeated four times for a total of twelve layers. Such a multilayer film, approximately 1 micron thick, deposited directly on SrTiO3 and annealed at 900 C for 45 min produces a film with a superconducting onset of 93 K and critical temperature of 85 K. Auger electron spectroscopy in conjunction with argon ion sputtering was used to obtain the distribution of each element as a function of depth for an unannealed film, the annealed film on SrTiO3 and annealed films on ZrO2 buffer layers. The individual layers were apparent. After annealing, the bulk of the film on SrTiO3 is observed to be fairly uniform while films on the substrates with buffer layers are less uniform. The Y-Ba-Cu-O/ZrO2 interface is broad with a long Ba tail into the ZrO2, suggesting interaction between the film and the buffer layer. The underlying ZrO2/Si interface is sharper. The detailed Auger results are presented and compared with samples annealed at different temperatures and durations.

  13. Influence of high-temperature processing on the surface properties of bulk AlN substrates

    NASA Astrophysics Data System (ADS)

    Tojo, Shunsuke; Yamamoto, Reo; Tanaka, Ryohei; Thieu, Quang Tu; Togashi, Rie; Nagashima, Toru; Kinoshita, Toru; Dalmau, Rafael; Schlesser, Raoul; Murakami, Hisashi; Collazo, Ramón; Koukitu, Akinori; Monemar, Bo; Sitar, Zlatko; Kumagai, Yoshinao

    2016-07-01

    Deep-level luminescence at 3.3 eV related to the presence of Al vacancies (VAl) was observed in room temperature photoluminescence (RT-PL) spectra of homoepitaxial AlN layers grown at 1450 °C by hydride vapor-phase epitaxy (HVPE) and cooled to RT in a mixture of H2 and N2 with added NH3. However, this luminescence disappeared after removing the near surface layer of AlN by polishing. In addition, the deep-level luminescence was not observed when the post-growth cooling of AlN was conducted without NH3. Secondary ion mass spectrometry (SIMS) studies revealed that although the point defect density of the interior of the AlN layers remained low, the near surface layer cooled in the presence of NH3 was contaminated by Si impurities due to both suppression of the surface decomposition by the added NH3 and volatilization of Si by decomposition of the quartz reactor walls at high temperatures. The deep-level luminescence reappeared after the polished AlN wafers were heated in presence of NH3 at temperatures above 1400 °C. The surface contamination by Si is thought to generate VAl near the surface by lowering their formation energy due to the Fermi level effect, resulting in deep-level luminescence at 3.3 eV caused by the shallow donor (Si) to VAl transition.

  14. Tuning the interfacial hole injection barrier between p-type organic materials and Co using a MoO{sub 3} buffer layer

    SciTech Connect

    Wang Yuzhan; Wee, Andrew T. S.; Cao Liang; Qi Dongchen; Chen Wei; Gao Xingyu

    2012-08-01

    We demonstrate that the interfacial hole injection barrier {Delta}{sub h} between p-type organic materials (i.e., CuPc and pentacene) and Co substrate can be tuned by the insertion of a MoO{sub 3} buffer layer. Using ultraviolet photoemission spectroscopy, it was found that the introduction of MoO{sub 3} buffer layer effectively reduces the hole injection barrier from 0.8 eV to 0.4 eV for the CuPc/Co interface, and from 1.0 eV to 0.4 eV for the pentacene/Co interface, respectively. In addition, by varying the thickness of the buffer, the tuning effect of {Delta}{sub h} is shown to be independent of the thickness of MoO{sub 3} interlayer at both CuPc/Co and pentacene/Co interfaces. This Fermi level pinning effect can be explained by the integer charge-transfer model. Therefore, the MoO{sub 3} buffer layer has the potential to be applied in p-type organic spin valve devices to improve the device performance via reducing the interfacial hole injection barrier.

  15. Issues and examples regarding growth of AlN, GaN and Al{sub x}Ga{sub 1{minus}x}N thin films via OMVPE and gas source MBE

    SciTech Connect

    Davis, R.F.; Weeks, T.W. Jr.; Bremser, M.D.; Tanaka, S.; Kern, R.S.; Sitar, Z.; Ailey, K.S.; Perry, W.G.; Wang, C.

    1996-11-01

    Organometallic vapor phase epitaxy (OMVPE) and molecular beam epitaxy (MBE) are the most common methods for the growth of thin films of AlN and GaN. Sapphire is the most common substrate; however, a host of materials have been used with varying degrees of success. Both growth techniques have been employed by the authors to grow AlN, GaN and Al{sub x}Ga{sub 1{minus}x}N thin films primarily on 6H-SiC(0001). The mismatch in atomic layer stacking sequences along the growth direction produces double positioning boundaries in AlN and the alloys at the SiC steps; the sequence problem appears to discourage the two-dimensional nucleation of GaN. Films of these materials grown by MBE at 650 C are textured; monocrystalline films are achieved between 850 C (pure GaN) and 1,050 C (pure AlN) by this technique and OMVPE. Donor and acceptor doping of GaN has been achieved via MBE without post growth annealing. Acceptor doping in CVD material requires annealing to displace the H from the Mg and eventually remove it from the material. High brightness light emitting diodes are commercially available; however, numerous concerns regarding metal and nitrogen sources, heteroepitaxial nucleation, the role of buffer layers, surface migration rates as a function of temperature, substantial defect densities and their effect on film and device properties, ohmic and rectifying contacts, wet and dry etching and suitable gate and field insulators must and are being addressed. Selected issues surrounding the growth of these materials with particular examples drawn from the authors` research are presented herein.

  16. Simultaneous enhancement of photovoltage and charge transfer in Cu{sub 2}O-based photocathode using buffer and protective layers

    SciTech Connect

    Li, Changli; Delaunay, Jean-Jacques; Hisatomi, Takashi; Watanabe, Osamu; Domen, Kazunari; Nakabayashi, Mamiko; Shibata, Naoya

    2016-07-18

    Coating n-type buffer and protective layers on Cu{sub 2}O may be an effective means to improve the photoelectrochemical (PEC) water-splitting performance of Cu{sub 2}O-based photocathodes. In this letter, the functions of the buffer layer and protective layer on Cu{sub 2}O are examined. It is found that a Ga{sub 2}O{sub 3} buffer layer can form a buried junction with Cu{sub 2}O, which inhibits Cu{sub 2}O self-reduction as well as increases the photovoltage through a small conduction band offset between the two semiconductors. The introduction of a TiO{sub 2} thin protective layer not only improves the stability of the photocathode but also enhances the electron transfer from the photocathode surface into the electrolyte, thus resulting in an increase in photocurrent at positive potentials. These results show that the selection of overlayers with appropriate conduction band positions provides an effective strategy for obtaining a high photovoltage and high photocurrent in PEC systems.

  17. Capacitance-voltage and retention characteristics of Pt/SrBi2Ta2O9/HfO2/Si structures with various buffer layer thickness

    NASA Astrophysics Data System (ADS)

    Tang, M. H.; Sun, Z. H.; Zhou, Y. C.; Sugiyama, Y.; Ishiwara, H.

    2009-05-01

    The metal-ferroelectric-insulator-semiconductor (MFIS) structure diodes with SrBi2Ta2O9 (SBT) as ferroelectric thin film and HfO2 as insulating buffer layer were fabricated. The electrical properties of MFIS structure were investigated for different HfO2 buffer layer thickness. The experimental results show that the memory window extended significantly as the HfO2 layer thickness increased from 6 to 10 nm. It is also observed that the leakage current was reduced to about 10-10 A at applied voltage of 4 V, and the high and low capacitances remained distinguishable for over 8 h even if we extrapolate the measured data to 10 years.

  18. Annealing induced structural changes in amorphous Co{sub 23}Fe{sub 60}B{sub 17} film on Mo buffer layer

    SciTech Connect

    Dwivedi, Jagrati Mishra, Ashutosh; Gupta, Ranjeeta; Sharma, Gagan; Gupta, Ajay; Gupta, Mukul

    2016-05-23

    Structural changes occurring in a thin amorphous Co{sub 23}Fe{sub 60}B{sub 17} film sandwiched between two Mo layers, as a function of thermal annealing has been studied. Thermal stability of the Co{sub 23}Fe{sub 60}B{sub 17} film is found to be significantly lower than the bulk ribbons. SIMS measurements show that during crystallization, boron which is expelled out of the crystallites, has a tendency to move towards the surface. No significant diffusion of boron in Mo buffer layer is observed. This result is in contrast with some earlier studies where it was proposed that the role of buffer layer of refractory metal is to absorb boron which is expelled out of the bcc FeCo phase during crystallization.

  19. Heteroepitaxy mechanisms of AlN on nitridated c- and a-plane sapphire substrates

    NASA Astrophysics Data System (ADS)

    Funato, Mitsuru; Shibaoka, Mami; Kawakami, Yoichi

    2017-02-01

    We investigate the metalorganic vapor phase epitaxy of c-oriented AlN on c- and a-plane sapphire substrates, focusing on the effect of sapphire nitridation on the AlN structure. Prior to AlN growth, the sapphire surface is subjected to nitridation via an in-situ NH3 treatment. We demonstrate that nitridation without H2 thermal etching treatment realizes high quality AlN on both c- and a-plane sapphires, indicating that a reaction between NH3 and oxygen on the sapphire surface is a critical factor in the material growth. It is proposed that nitridation initially creates nanometer-scale inversion domains in the AlN epilayer, but as growth proceeds, the N-polar domains are annihilated, leaving voids. Such growth behaviors can be regarded as spontaneous selective area growth with strain-adsorbing void formation, and lead to crack-free, ˜5 μm thick AlN layers, which produce x-ray line widths as narrow as 180 and 483 arc sec for the (0002) and ( 10 1 ¯ 2 ) reflections, respectively, on c-plane sapphire, and 237 and 433 arc sec for these reflections on a-plane sapphire.

  20. Improved performance of organic light-emitting devices based on 1,4-bis(5-phenylthiophen-2-yl)benzene single crystals by using an anodic buffer layer

    NASA Astrophysics Data System (ADS)

    Dong, Feng-Xi; Ding, Ran; Hotta, Shu; Li, Ai-Wu

    2017-06-01

    Green single crystal-based light-emitting devices based on 1,4-bis(5-phenylthiophen-2-yl)benzene (AC5) crystals have been realized by template stripping method. And double-layered structure with a molybdenum oxide (MoO3) layer is employed as anodic buffer layer to lower the carrier injection barrier. On the basis of this structure, the AC5 crystal-based OLEDs exhibit a significantly lower turn-on voltage of 5 V and higher luminance reaching 28.96 cd/m2, which open a realistic route towards their practical application in optoelectronic devices.