Alternating phase-shifted mask for logic gate levels, design, and mask manufacturing
NASA Astrophysics Data System (ADS)
Liebmann, Lars W.; Graur, Ioana C.; Leipold, William C.; Oberschmidt, James M.; O'Grady, David S.; Regaill, Denis
1999-07-01
While the benefits of alternating phase shifted masks in improving lithographic process windows at increased resolution are well known throughout the lithography community, broad implementation of this potentially powerful technique has been slow due to the inherent complexity of the layout design and mask manufacturing process. This paper will review a project undertaken at IBM's Semiconductor Research and Development Center and Mask Manufacturing and Development facility to understand the technical and logistical issues associated with the application of alternating phase shifted mask technology to the gate level of a full microprocessor chip. The work presented here depicts an important milestone toward integration of alternating phase shifted masks into the manufacturing process by demonstrating an automated design solution and yielding a functional alternating phase shifted mask. The design conversion of the microprocessor gate level to a conjugate twin shifter alternating phase shift layout was accomplished with IBM's internal design system that automatically scaled the design, added required phase regions, and resolved phase conflicts. The subsequent fabrication of a nearly defect free phase shifted mask, as verified by SEM based die to die inspection, highlights the maturity of the alternating phase shifted mask manufacturing process in IBM's internal mask facility. Well defined and recognized challenges in mask inspection and repair remain and the layout of alternating phase shifted masks present a design and data preparation overhead, but the data presented here demonstrate the feasibility of designing and building manufacturing quality alternating phase shifted masks for the gate level of a microprocessor.
Coma measurement by transmission image sensor with a PSM
NASA Astrophysics Data System (ADS)
Wang, Fan; Wang, Xiangzhao; Ma, Mingying; Zhang, Dongqing; Shi, Weijie; Hu, Jianming
2005-01-01
As feature size decreases, especially with the use of resolution enhancement technique such as off axis illumination and phase shifting mask, fast and accurate in-situ measurement of coma has become very important in improving the performance of modern lithographic tools. The measurement of coma can be achieved by the transmission image sensor, which is an aerial image measurement device. The coma can be determined by measuring the positions of the aerial image at multiple illumination settings. In the present paper, we improve the measurement accuracy of the above technique with an alternating phase shifting mask. Using the scalar diffraction theory, we analyze the effect of coma on the aerial image. To analyze the effect of the alternating phase shifting mask, we compare the pupil filling of the mark used in the above technique with that of the phase-shifted mark used in the new technique. We calculate the coma-induced image displacements of the marks at multiple partial coherence and NA settings, using the PROLITH simulation program. The simulation results show that the accuracy of coma measurement can increase approximately 20 percent using the alternating phase shifting mask.
NASA Astrophysics Data System (ADS)
Ohnuma, Hidetoshi; Kawahira, Hiroichi
1998-09-01
An automatic alternative phase shift mask (PSM) pattern layout tool has been newly developed. This tool is dedicated for embedded DRAM in logic device to shrink gate line width with improving line width controllability in lithography process with a design rule below 0.18 micrometers by the KrF excimer laser exposure. The tool can crete Levenson type PSM used being coupled with a binary mask adopting a double exposure method for positive photo resist. By using graphs, this tool automatically creates alternative PSM patterns. Moreover, it does not give any phase conflicts. By adopting it to actual embedded DRAM in logic cells, we have provided 0.16 micrometers gate resist patterns at both random logic and DRAM areas. The patterns were fabricated using two masks with the double exposure method. Gate line width has been well controlled under a practical exposure-focus window.
Rigorous diffraction analysis using geometrical theory of diffraction for future mask technology
NASA Astrophysics Data System (ADS)
Chua, Gek S.; Tay, Cho J.; Quan, Chenggen; Lin, Qunying
2004-05-01
Advanced lithographic techniques such as phase shift masks (PSM) and optical proximity correction (OPC) result in a more complex mask design and technology. In contrast to the binary masks, which have only transparent and nontransparent regions, phase shift masks also take into consideration transparent features with a different optical thickness and a modified phase of the transmitted light. PSM are well-known to show prominent diffraction effects, which cannot be described by the assumption of an infinitely thin mask (Kirchhoff approach) that is used in many commercial photolithography simulators. A correct prediction of sidelobe printability, process windows and linearity of OPC masks require the application of rigorous diffraction theory. The problem of aerial image intensity imbalance through focus with alternating Phase Shift Masks (altPSMs) is performed and compared between a time-domain finite-difference (TDFD) algorithm (TEMPEST) and Geometrical theory of diffraction (GTD). Using GTD, with the solution to the canonical problems, we obtained a relationship between the edge on the mask and the disturbance in image space. The main interest is to develop useful formulations that can be readily applied to solve rigorous diffraction for future mask technology. Analysis of rigorous diffraction effects for altPSMs using GTD approach will be discussed.
In Situ alignment system for phase-shifting point-diffraction interferometry
Goldberg, Kenneth Alan; Naulleau, Patrick P.
2000-01-01
A device and method to facilitate the gross alignment of patterned object- and image-plane masks in optical systems such as the phase-shifting point diffraction interferometer are provided. When an array of similar pinholes or discreet mask fields is used, confusion can occur over the alignment of the focused beams within the field. Adding to the mask pattern a circumscribed or inscribed set of symbols that are identifiable in situ facilitates the unambiguous gross alignment of the object- and/or image-plane masks. Alternatively, a system of markings can be encoded directly into the window shape to accomplish this same task.
Optical DC overlay measurement in the 2nd level process of 65 nm alternating phase shift mask
NASA Astrophysics Data System (ADS)
Ma, Jian; Han, Ke; Lee, Kyung; Korobko, Yulia; Silva, Mary; Chavez, Joas; Irvine, Brian; Henrichs, Sven; Chakravorty, Kishore; Olshausen, Robert; Chandramouli, Mahesh; Mammen, Bobby; Padmanaban, Ramaswamy
2005-11-01
Alternating phase shift mask (APSM) techniques help bridge the significant gap between the lithography wavelength and the patterning of minimum features, specifically, the poly line of 35 nm gate length (1x) in Intel's 65 nm technology. One of key steps in making APSM mask is to pattern to within the design tolerances the 2nd level resist so that the zero-phase apertures will be protected by the resist and the pi-phase apertures will be wide open for quartz etch. The ability to align the 2nd level to the 1st level binary pattern, i.e. the 2nd level overlay capability is very important, so is the capability of measuring the overlay accurately. Poor overlay could cause so-called the encroachment after quartz etch, producing undesired quartz bumps in the pi-apertures or quartz pits in the zero-apertures. In this paper, a simple, low-cost optical setup for the 2nd level DC (develop check) overlay measurements in the high volume manufacturing (HVM) of APSM masks is presented. By removing systematic errors in overlay associated with TIS and MIS (tool-induced shift and Mask-process induced shift), it is shown that this setup is capable of supporting the measurement of DC overlay with a tolerance as small as +/- 25 nm. The outstanding issues, such as DC overlay error component analysis, DC - FC (final check) overlay correlation and the overlay linearity (periphery vs. indie), are discussed.
Preliminary results for mask metrology using spatial heterodyne interferometry
NASA Astrophysics Data System (ADS)
Bingham, Philip R.; Tobin, Kenneth; Bennett, Marylyn H.; Marmillion, Pat
2003-12-01
Spatial heterodyne interferometry (SHI) is an imaging technique that captures both the phase and amplitude of a complex wavefront in a single high-speed image. This technology was developed at the Oak Ridge National Laboratory (ORNL) and is currently being implemented for semiconductor wafer inspection by nLine Corporation. As with any system that measures phase, metrology and inspection of surface structures is possible by capturing a wavefront reflected from the surface. The interpretation of surface structure heights for metrology applications can become very difficult with the many layers of various materials used on semiconductor wafers, so inspection (defect detection) has been the primary focus for semiconductor wafers. However, masks used for photolithography typically only contain a couple well-defined materials opening the doors to high-speed mask metrology in 3 dimensions in addition to inspection. Phase shift masks often contain structures etched out of the transparent substrate material for phase shifting. While these structures are difficult to inspect using only intensity, the phase and amplitude images captured with SHI can produce very good resolution of these structures. The phase images also provide depth information that is crucial for these phase shift regions. Preliminary testing has been performed to determine the feasibility of SHI for high-speed non-contact mask metrology using a prototype SHI system with 532 nm wavelength illumination named the Visible Alpha Tool (VAT). These results show that prototype SHI system is capable of performing critical dimension measurements on 400nm lines with a repeatability of 1.4nm and line height measurements with a repeatability of 0.26nm. Additionally initial imaging of an alternating aperture phase shift mask has shown the ability of SHI to discriminate between typical phase shift heights.
Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width
DOE Office of Scientific and Technical Information (OSTI.GOV)
Qiu Zicheng; Wang Xiangzhao; Yuan Qiongyan
2009-01-10
The correlation between the coma sensitivity of the alternating phase-shifting mask (Alt-PSM) mark and the mark's structure is studied based on the Hopkins theory of partially coherent imaging and positive resist optical lithography (PROLITH) simulation. It is found that an optimized Alt-PSM mark with its phase width being two-thirds its pitch has a higher sensitivity to coma than Alt-PSM marks with the same pitch and the different phase widths. The pitch of the Alt-PSM mark is also optimized by PROLITH simulation, and the structure of p=1.92{lambda}/NA and pw=2p/3 proves to be with the highest sensitivity. The optimized Alt-PSM mark ismore » used as a measurement mark to retrieve coma aberration from the projection optics in lithographic tools. In comparison with an ordinary Alt-PSM mark with its phase width being a half its pitch, the measurement accuracies of Z7 and Z14 apparently increase.« less
Etched-multilayer phase shifting masks for EUV lithography
Chapman, Henry N.; Taylor, John S.
2005-04-05
A method is disclosed for the implementation of phase shifting masks for EUV lithography. The method involves directly etching material away from the multilayer coating of the mask, to cause a refractive phase shift in the mask. By etching into the multilayer (for example, by reactive ion etching), rather than depositing extra material on the top of the multilayer, there will be minimal absorption loss associated with the phase shift.
NASA Astrophysics Data System (ADS)
Ozawa, Ken; Komizo, Tooru; Ohnuma, Hidetoshi
2002-07-01
An alternative phase shift mask (alt-PSM) is a promising device for extending optical lithography to finer design rules. There have been few reports, however, on the mask's ability to identify phase defects. We report here an alt-PSM of a single-trench type with undercut for ArF exposure, with programmed phase defects used to evaluate defect printability by measuring aerial images with a Zeiss MSM193 measuring system. The experimental results are simulated using the TEMPEST program. First, a critical comparison of the simulation and the experiment is conducted. The actual measured topographies of quartz defects are used in the simulation. Moreover, a general simulation study on defect printability using an alt-PSM for ArF exposure is conducted. The defect dimensions, which produce critical CD errors, are determined by simulation that takes into account the full 3-dimensional structure of phase defects as well as a simplified structure. The critical dimensions of an isolated bump defect identified by the alt-PSM of a single-trench type with undercut for ArF exposure are 300 nm in bottom dimension and 74 degrees in height (phase) for the real shape, where the depth of wet-etching is 100 nm and the CD error limit is +/- 5 percent.
NASA Astrophysics Data System (ADS)
Ozawa, Ken; Komizo, Tooru; Kikuchi, Koji; Ohnuma, Hidetoshi; Kawahira, Hiroichi
2002-07-01
An alternative phase shift mask (alt-PSM) is a promising device for extending optical lithography to finer design rules. There have been few reports, however, on the mask's ability to identify phase defects. We report here an alt-PSM of a dual-trench type for KrF exposure, with programmed quartz defects used to evaluate defect printability by measuring aerial images with a Zeiss MSM100 measuring system. The experimental results are simulated using the TEMPEST program. First, a critical comparison of the simulation and the experiment is conducted. The actual measured topography of quartz defects are used in the simulation. Moreover, a general simulation study on defect printability using an alt-PSM for ArF exposure is conducted. The defect dimensions, which produce critical CD errors are determined by simulation that takes into account the full 3-dimensional structure of phase defects as well as a simplified structure. The critical dimensions of an isolated defect identified by the alt-PSM of a single-trench type for ArF exposure are 240 nm in bottom diameter and 50 degrees in height (phase) for the cylindrical shape and 240 nm in bottom diameter and 90 degrees in height (phase) for the rotating trapezoidal shape, where the CD error limit is +/- 5%.
EUV phase-shifting masks and aberration monitors
NASA Astrophysics Data System (ADS)
Deng, Yunfei; Neureuther, Andrew R.
2002-07-01
Rigorous electromagnetic simulation with TEMPEST is used to examine the use of phase-shifting masks in EUV lithography. The effects of oblique incident illumination and mask patterning by ion-mixing of multilayers are analyzed. Oblique incident illumination causes streamers at absorber edges and causes position shifting in aerial images. The diffraction waves between ion-mixed and pristine multilayers are observed. The phase-shifting caused by stepped substrates is simulated and images show that it succeeds in creation of phase-shifting effects. The diffraction process at the phase boundary is also analyzed. As an example of EUV phase-shifting masks, a coma pattern and probe based aberration monitor is simulated and aerial images are formed under different levels of coma aberration. The probe signal rises quickly as coma increases as designed.
NASA Astrophysics Data System (ADS)
Kojima, Yosuke; Shirasaki, Masanori; Chiba, Kazuaki; Tanaka, Tsuyoshi; Inazuki, Yukio; Yoshikawa, Hiroki; Okazaki, Satoshi; Iwase, Kazuya; Ishikawa, Kiichi; Ozawa, Ken
2007-05-01
For 45 nm node and beyond, the alternating phase-shift mask (alt. PSM), one of the most expected resolution enhancement technologies (RET) because of its high image contrast and small mask error enhancement factor (MEEF), and the binary mask (BIM) attract attention. Reducing CD and registration errors and defect are their critical issues. As the solution, the new blank for alt. PSM and BIM is developed. The top film of new blank is thin Cr, and the antireflection film and shielding film composed of MoSi are deposited under the Cr film. The mask CD performance is evaluated for through pitch, CD linearity, CD uniformity, global loading, resolution and pattern fidelity, and the blank performance is evaluated for optical density, reflectivity, sheet resistance, flatness and defect level. It is found that the performance of new blank is equal to or better than that of conventional blank in all items. The mask CD performance shows significant improvement. The lithography performance of new blank is confirmed by wafer printing and AIMS measurement. The full dry type alt. PSM has been used as test plate, and the test results show that new blank can almost meet the specifications of pi-0 CD difference, CD uniformity and process margin for 45 nm node. Additionally, the new blank shows the better pattern fidelity than that of conventional blank on wafer. AIMS results are almost same as wafer results except for the narrowest pattern. Considering the result above, this new blank can reduce the mask error factors of alt. PSM and BIM for 45 nm node and beyond.
NASA Astrophysics Data System (ADS)
Griesinger, Uwe A.; Dettmann, Wolfgang; Hennig, Mario; Heumann, Jan P.; Koehle, Roderick; Ludwig, Ralf; Verbeek, Martin; Zarrabian, Mardjan
2002-07-01
In optical lithography balancing the aerial image of an alternating phase shifting mask (alt. PSM) is a major challenge. For the exposure wavelengths (currently 248nm and 193nm) an optimum etching method is necessary to overcome imbalance effects. Defects play an important role in the imbalances of the aerial image. In this contribution defects will be discussed by using the methodology of global phase imbalance control also for local imbalances which are a result of quartz defects. The effective phase error can be determined with an AIMS-system by measuring the CD width between the images of deep- and shallow trenches at different focus settings. The AIMS results are analyzed in comparison to the simulated and lithographic print results of the alternating structures. For the analysis of local aerial image imbalances it is necessary to investigate the capability of detecting these phase defects with state of the art inspection systems. Alternating PSMs containing programmed defects were inspected with different algorithms to investigate the capture rate of special phase defects in dependence on the defect size. Besides inspection also repair of phase defects is an important task. In this contribution we show the effect of repair on the optical behavior of phase defects. Due to the limited accuracy of the repair tools the repaired area still shows a certain local phase error. This error can be caused either by residual quartz material or a substrate damage. The influence of such repair induced phase errors on the aerial image were investigated.
Gao, Liang; Chen, Xiangfei; Xiong, Jintian; Liu, Shengchun; Pu, Tao
2012-01-30
Based on reconstruction-equivalent-chirp (REC) technique, a novel solution for fabricating low-cost long fiber Bragg gratings (FBGs) with desired properties is proposed and initially studied. A proof-of-concept experiment is demonstrated with two conventional uniform phase masks and a submicron-precision translation stage, successfully. It is shown that the original phase shift (OPS) caused by phase mismatch of the two phase masks can be compensated by the equivalent phase shift (EPS) at the ±1st channels of sampled FBGs, separately. Furthermore, as an example, a π phase-shifted FBG of about 90 mm is fabricated by using these two 50mm-long uniform phase masks based on the presented method.
NASA Astrophysics Data System (ADS)
Hénault, François; Carlotti, Alexis; Vérinaud, Christophe
2017-09-01
With the recent commissioning of ground instruments such as SPHERE or GPI and future space observatories like WFIRST-AFTA, coronagraphy should probably become the most efficient tool for identifying and characterizing extrasolar planets in the forthcoming years. Coronagraphic instruments such as Phase mask coronagraphs (PMC) are usually based on a phase mask or plate located at the telescope focal plane, spreading the starlight outside the diameter of a Lyot stop that blocks it. In this communication is investigated the capability of a PMC to act as a phase-shifting wavefront sensor for better control of the achieved star extinction ratio in presence of the coronagraphic mask. We discuss the two main implementations of the phase-shifting process, either introducing phase-shifts in a pupil plane and sensing intensity variations in an image plane, or reciprocally. Conceptual optical designs are described in both cases. Numerical simulations allow for better understanding of the performance and limitations of both options, and optimizing their fundamental parameters. In particular, they demonstrate that the phase-shifting process is a bit more efficient when implemented into an image plane, and is compatible with the most popular phase masks currently employed, i.e. fourquadrants and vortex phase masks.
Effects of hard mask etch on final topography of advanced phase shift masks
NASA Astrophysics Data System (ADS)
Hortenbach, Olga; Rolff, Haiko; Lajn, Alexander; Baessler, Martin
2017-07-01
Continuous shrinking of the semiconductor device dimensions demands steady improvements of the lithographic resolution on wafer level. These requirements challenge the photomask industry to further improve the mask quality in all relevant printing characteristics. In this paper topography of the Phase Shift Masks (PSM) was investigated. Effects of hard mask etch on phase shift uniformity and mask absorber profile were studied. Design of experiments method (DoE) was used for the process optimization, whereas gas composition, bias power of the hard mask main etch and bias power of the over-etch were varied. In addition, influence of the over-etch time was examined at the end of the experiment. Absorber depth uniformity, sidewall angle (SWA), reactive ion etch lag (RIE lag) and through pitch (TP) dependence were analyzed. Measurements were performed by means of Atomic-force microscopy (AFM) using critical dimension (CD) mode with a boot-shaped tip. Scanning electron microscope (SEM) cross-section images were prepared to verify the profile quality. Finally CD analysis was performed to confirm the optimal etch conditions. Significant dependence of the absorber SWA on hard mask (HM) etch conditions was observed revealing an improvement potential for the mask absorber profile. It was found that hard mask etch can leave a depth footprint in the absorber layer. Thus, the etch depth uniformity of hard mask etch is crucial for achieving a uniform phase shift over the active mask area. The optimized hard mask etch process results in significantly improved mask topography without deterioration of tight CD specifications.
Phase-shifting point diffraction interferometer mask designs
Goldberg, Kenneth Alan
2001-01-01
In a phase-shifting point diffraction interferometer, different image-plane mask designs can improve the operation of the interferometer. By keeping the test beam window of the mask small compared to the separation distance between the beams, the problem of energy from the reference beam leaking through the test beam window is reduced. By rotating the grating and mask 45.degree., only a single one-dimensional translation stage is required for phase-shifting. By keeping two reference pinholes in the same orientation about the test beam window, only a single grating orientation, and thus a single one-dimensional translation stage, is required. The use of a two-dimensional grating allows for a multiplicity of pinholes to be used about the pattern of diffracted orders of the grating at the mask. Orientation marks on the mask can be used to orient the device and indicate the position of the reference pinholes.
Method for the manufacture of phase shifting masks for EUV lithography
Stearns, Daniel G.; Sweeney, Donald W.; Mirkarimi, Paul B.; Barty, Anton
2006-04-04
A method for fabricating an EUV phase shift mask is provided that includes a substrate upon which is deposited a thin film multilayer coating that has a complex-valued reflectance. An absorber layer or a buffer layer is attached onto the thin film multilayer, and the thickness of the thin film multilayer coating is altered to introduce a direct modulation in the complex-valued reflectance to produce phase shifting features.
Designs and Materials for Better Coronagraph Occulting Masks
NASA Technical Reports Server (NTRS)
Balasubramanian, Kunjithapatham
2010-01-01
New designs, and materials appropriate for such designs, are under investigation in an effort to develop coronagraph occulting masks having broad-band spectral characteristics superior to those currently employed. These designs and materials are applicable to all coronagraphs, both ground-based and spaceborne. This effort also offers potential benefits for the development of other optical masks and filters that are required (1) for precisely tailored spatial transmission profiles, (2) to be characterized by optical-density neutrality and phase neutrality (that is, to be characterized by constant optical density and constant phase over broad wavelength ranges), and/or (3) not to exhibit optical- density-dependent phase shifts. The need for this effort arises for the following reasons: Coronagraph occulting masks are required to impose, on beams of light transmitted through them, extremely precise control of amplitude and phase according to carefully designed transmission profiles. In the original application that gave rise to this effort, the concern has been to develop broad-band occulting masks for NASA s Terrestrial Planet Finder coronagraph. Until now, experimental samples of these masks have been made from high-energy-beam-sensitive (HEBS) glass, which becomes locally dark where irradiated with a high-energy electron beam, the amount of darkening depending on the electron-beam energy and dose. Precise mask profiles have been written on HEBS glass blanks by use of electron beams, and the masks have performed satisfactorily in monochromatic light. However, the optical-density and phase profiles of the HEBS masks vary significantly with wavelength; consequently, the HEBS masks perform unsatisfactorily in broad-band light. The key properties of materials to be used in coronagraph occulting masks are their extinction coefficients, their indices of refraction, and the variations of these parameters with wavelength. The effort thus far has included theoretical predictions of performances of masks that would be made from alternative materials chosen because the wavelength dependences of their extinction coefficients and their indices of refraction are such that that the optical-density and phase profiles of masks made from these materials can be expected to vary much less with wavelength than do those of masks made from HEBS glass. The alternative materials considered thus far include some elemental metals such as Pt and Ni, metal alloys such as Inconel, metal nitrides such as TiN, and dielectrics such as SiO2. A mask as now envisioned would include thin metal and dielectric films having stepped or smoothly varying thicknesses (see figure). The thicknesses would be chosen, taking account of the indices of refraction and extinction coefficients, to obtain an acceptably close approximation of the desired spatial transmittance profile with a flat phase profile
Investigation of phase distribution using Phame® in-die phase measurements
NASA Astrophysics Data System (ADS)
Buttgereit, Ute; Perlitz, Sascha
2009-03-01
As lithography mask processes move toward 45nm and 32nm node, mask complexity increases steadily, mask specifications tighten and process control becomes extremely important. Driven by this fact the requirements for metrology tools increase as well. Efforts in metrology have been focused on accurately measuring CD linearity and uniformity across the mask, and accurately measuring phase variation on Alternating/Attenuated PSM and transmission for Attenuated PSM. CD control on photo masks is usually done through the following processes: exposure dose/focus change, resist develop and dry etch. The key requirement is to maintain correct CD linearity and uniformity across the mask. For PSM specifically, the effect of CD uniformity for both Alternating PSM and Attenuated PSM and etch depth for Alternating PSM becomes also important. So far phase measurement has been limited to either measuring large-feature phase using interferometer-based metrology tools or measuring etch depth using AFM and converting etch depth into phase under the assumption that trench profile and optical properties of the layers remain constant. However recent investigations show that the trench profile and optical property of layers impact the phase. This effect is getting larger for smaller CD's. The currently used phase measurement methods run into limitations because they are not able to capture 3D mask effects, diffraction limitations or polarization effects. The new phase metrology system - Phame(R) developed by Carl Zeiss SMS overcomes those limitations and enables laterally resolved phase measurement in any kind of production feature on the mask. The resolution of the system goes down to 120nm half pitch at mask level. We will report on tool performance data with respect to static and dynamic phase repeatability focusing on Alternating PSM. Furthermore the phase metrology system was used to investigate mask process signatures on Alternating PSM in order to further improve the overall PSM process performance. Especially global loading effects caused by the pattern density and micro loading effects caused by the feature size itself have been evaluated using the capability of measuring phase in the small production features. The results of this study will be reported in this paper.
Revisiting adoption of high transmission PSM: pros, cons and path forward
NASA Astrophysics Data System (ADS)
Ma, Z. Mark; McDonald, Steve; Progler, Chris
2009-12-01
High transmission attenuated phase shift masks (Hi-T PSM) have been successfully applied in volume manufacturing for certain memory devices. Moreover, numerous studies have shown the potential benefits of Hi-T PSM for specific lithography applications. In this paper, the potential for extending Hi-T PSM to logic devices, is revisited with an emphasis on understanding layout, transmission, and manufacturing of Hi-T PSM versus traditional 6% embedded attenuated phase shift mask (EAPSM). Simulations on various layouts show Hi-T PSM has advantage over EAPSM in low duty cycle line patterns and high duty cycle space patterns. The overall process window can be enhanced when Hi- T PSM is combined with optimized optical proximity correction (OPC), sub-resolution assist features (SRAF), and source illumination. Therefore, Hi-T PSM may be a viable and lower cost alternative to other complex resolution enhancement technology (RET) approaches. Aerial image measurement system (AIMS) results on test masks, based on an inverse lithography technology (ILT) generated layout, confirm the simulation results. New advancement in high transmission blanks also make low topography Hi-T PSM a reality, which can minimize scattering effects in high NA lithography.
NASA Astrophysics Data System (ADS)
Seo, Hwan-Seok; Lee, Dong-Gun; Ahn, Byung-Sup; Han, Hakseung; Huh, Sungmin; Kang, In-Yong; Kim, Hoon; Kim, Dongwan; Kim, Seong-Sue; Cho, Han-Ku
2009-03-01
Phase-shifting EUVL masks applying thinner absorber are investigated to design optimum mask structure with less shadowing problems. Simulations using S-Litho show that H-V bias in Si capping structure is higher than that of Ru capping since the high n (= 0.999) of Si increases sensible absorber height. Phase differences obtained from the patterned masks using the EUV CSM are well-matched with the calculated values using the practical refractive index of absorber materials. Although the mask with 62.4-nm-thick absorber, among the in-house masks, shows the closest phase ΔΦ(= 176°) to the out-of-phase condition, higher NILS and contrast as well as lower H-V bias are obtained with 52.4-nm-thick absorber (ΔΦ = 151°) which has higher R/R0 ratio. MET results also show that lithography performances including MEEF, PW, and resist threshold (dose), are improved with thinner absorber structure. However, low OD in EUVL mask, especially in thinner absorber structure, results in light leakage from the neighboring exposure shots, and thus an appropriate light-shielding layer should be introduced.
Novel contact hole reticle design for enhanced lithography process window in IC manufacturing
NASA Astrophysics Data System (ADS)
Chang, Chung-Hsing
2005-01-01
For 90nm node generation, 65nm, and beyond, dark field mask types such as contact-hole, via, and trench patterns that all are very challenging to print with satisfactory process windows for day-to-day lithography manufacturing. Resolution enhancement technology (RET) masks together with ArF high numerical aperture (NA) scanners have been recognized as the inevitable choice of method for 65nm node manufacturing. Among RET mask types, the alternating phase shifting mask (AltPSM) is one of the well-known strong enhancement techniques. However AltPSM can have a very strong optical proximity effect that comes with the use of small on-axis illumination sigma setting. For very dense contact features, it may be possible for AltPSM to overcome the phase conflict by limiting the mask design rules. But it is not feasible to resolve the inherent phase conflict for the semi-dense, semi-isolated and isolated contact areas. Hence the adoption of this strong enhancement technique for dark filed mask types in today"s IC manufacturing has been very limited. In this paper, we present a novel yet a very powerful design method to achieve contact and via masks printing for 90nm, 65nm, and beyond. We name our new mask design as: Novel Improved Contact-hole pattern Exposure PSM (NICE PSM) with off-axis illumination, such as QUASAR. This RET masks design can enhance the process window of isolated, semi-isolated contact hole and via hole patterns. The main concepts of NICE PSM with QUASAR off-axis illumination are analogous to the Super-FLEX pupil filter technology.
Novel contact hole reticle design for enhanced lithography process window in IC manufacturing
NASA Astrophysics Data System (ADS)
Chang, Chung-Hsing
2004-10-01
For 90nm node generation, 65nm, and beyond, dark field mask types such as contact-hole, via, and trench patterns that all are very challenging to print with satisfactory process windows for day-to-day lithography manufacturing. Resolution enhancement technology (RET) masks together with ArF high numerical aperture (NA) scanners have been recognized as the inevitable choice of method for 65nm node manufacturing. Among RET mask types, the alternating phase shifting mask (AltPSM) is one of the well-known strong enhancement techniques. However, AltPSM can have a very strong optical proximity effect that comes with the use of small on-axis illumination sigma setting. For very dense contact features, it may be possible for AltPSM to overcome the phase conflict by limiting the mask design rules. But it is not feasible to resolve the inherent phase conflict for the semi-dense, semi-isolated and isolated contact areas. Hence the adoption of this strong enhancement technique for dark filed mask types in today"s IC manufacturing has been very limited. In this paper, we report a novel yet a very powerful design method to achieve contact and via masks printing for 90nm, 65nm, and beyond. We name our new mask design as: Novel Improved Contact-hole pattern Exposure PSM (NICE PSM) with off-axis illumination, such as QUASAR. This RET masks design can enhance the process window of isolated, semi-isolated contact hole and via hole patterns. The main concepts of NICE PSM with QUASAR off-axis illumination are analogous to the Super-FLEX pupil filter technology.
Edge effects in phase-shifting masks for 0.25-µm lithography
NASA Astrophysics Data System (ADS)
Wong, Alfred K. K.; Neureuther, Andrew R.
1993-03-01
The impact on image quality of scattering from phase-shifter edges and of interactions between phase-shifter and chrome edges is assessed using rigorous electromagnetic simulation. Effects of edge taper in phase-shift masks, spacing between phase-shifter and chrome edges, small outrigger features with a trench phase-shifter, and of the repair of phase defects by etching to 360 degree(s) are considered. Near field distributions and diffraction efficiencies are examined and images are compared with more approximate results from the commonly used Hopkins' theory of imaging.
NASA Astrophysics Data System (ADS)
Van Den Broeke, Douglas J.; Laidig, Thomas L.; Chen, J. Fung; Wampler, Kurt E.; Hsu, Stephen D.; Shi, Xuelong; Socha, Robert J.; Dusa, Mircea V.; Corcoran, Noel P.
2004-08-01
Imaging contact and via layers continues to be one of the major challenges to be overcome for 65nm node lithography. Initial results of using ASML MaskTools' CPL Technology to print contact arrays through pitch have demonstrated the potential to further extend contact imaging to a k1 near 0.30. While there are advantages and disadvantages for any potential RET, the benefits of not having to solve the phase assignment problem (which can lead to unresolvable phase conflicts), of it being a single reticle - single exposure technique, and its application to multiple layers within a device (clear field and dark field) make CPL an attractive, cost effective solution to low k1 imaging. However, real semiconductor circuit designs consist of much more than regular arrays of contact holes and a method to define the CPL reticle design for a full chip circuit pattern is required in order for this technique to be feasible in volume manufacturing. Interference Mapping Lithography (IML) is a novel approach for defining optimum reticle patterns based on the imaging conditions that will be used when the wafer is exposed. Figure 1 shows an interference map for an isolated contact simulated using ASML /1150 settings of 0.75NA and 0.92/0.72/30deg Quasar illumination. This technique provides a model-based approach for placing all types features (scattering bars, anti-scattering bars, non-printing assist features, phase shifted and non-phase shifted) for the purpose of enhancing the resolution of the target pattern and it can be applied to any reticle type including binary (COG), attenuated phase shifting mask (attPSM), alternating aperture phase shifting mask (altPSM), and CPL. In this work, we investigate the application of IML to generate CPL reticle designs for random contact patterns that are typical for 65nm node logic devices. We examine the critical issues related to using CPL with Interference Mapping Lithography including controlling side lobe printing, contact patterns with odd symmetry, forbidden pitch regions, and reticle manufacturing constraints. Multiple methods for deriving the interference map used to define reticle patterns for various RET's will be discussed. CPL reticle designs that were created from implementing automated algorithms for contact pattern decomposition using MaskWeaver will also be presented.
Instantaneous phase-shifting Fizeau interferometry with high-speed pixelated phase-mask camera
NASA Astrophysics Data System (ADS)
Yatagai, Toyohiko; Jackin, Boaz Jessie; Ono, Akira; Kiyohara, Kosuke; Noguchi, Masato; Yoshii, Minoru; Kiyohara, Motosuke; Niwa, Hayato; Ikuo, Kazuyuki; Onuma, Takashi
2015-08-01
A Fizeou interferometer with instantaneous phase-shifting ability using a Wollaston prism is designed. to measure dynamic phase change of objects, a high-speed video camera of 10-5s of shutter speed is used with a pixelated phase-mask of 1024 × 1024 elements. The light source used is a laser of wavelength 532 nm which is split into orthogonal polarization states by passing through a Wollaston prism. By adjusting the tilt of the reference surface it is possible to make the reference and object beam with orthogonal polarizations states to coincide and interfere. Then the pixelated phase-mask camera calculate the phase changes and hence the optical path length difference. Vibration of speakers and turbulence of air flow were successfully measured in 7,000 frames/sec.
Performance of repaired defects and attPSM in EUV multilayer masks
NASA Astrophysics Data System (ADS)
Deng, Yunfei; La Fontaine, Bruno; Neureuther, Andrew R.
2002-12-01
The imaging performance of non-planar topographies in EUV masks for both partially repaired defects and non-planar attenuating phase-shifting masks made with repair treatments are evaluated using rigorous electromagnetic simulation with TEMPEST. Typical topographies produced by treatment techniques in the literature such as removal of top layers and compaction produced by electron-beam heating are considered. Isolated defects on/near the surface repaired by material removal are shown to result in an image intensity within 5% of the clear field value. Deeply buried defects within the multilayer treated by electron-beam heating can be repaired to 3% of the clear field but over repair can result in some degradation. Compaction from a 6.938 nm period to a 6.312 nm period shows a 540° phase-shift and an intensity reduced to about 6% suggesting such a treatment may be used to create attenuated phase-shifting masks for EUV. The quality of the aerial image for such a mask is studied as a function of the lateral transition distance between treated and untreated regions.
Lithographic performance comparison with various RET for 45-nm node with hyper NA
NASA Astrophysics Data System (ADS)
Adachi, Takashi; Inazuki, Yuichi; Sutou, Takanori; Kitahata, Yasuhisa; Morikawa, Yasutaka; Toyama, Nobuhito; Mohri, Hiroshi; Hayashi, Naoya
2006-05-01
In order to realize 45 nm node lithography, strong resolution enhancement technology (RET) and water immersion will be needed. In this research, we discussed about various RET performance comparison for 45 nm node using 3D rigorous simulation. As a candidate, we chose binary mask (BIN), several kinds of attenuated phase-shifting mask (att-PSM) and chrome-less phase-shifting lithography mask (CPL). The printing performance was evaluated and compared for each RET options, after the optimizing illumination conditions, mask structure and optical proximity correction (OPC). The evaluation items of printing performance were CD-DOF, contrast-DOF, conventional ED-window and MEEF, etc. It's expected that effect of mask 3D topography becomes important at 45 nm node, so we argued about not only the case of ideal structures, but also the mask topography error effects. Several kinds of mask topography error were evaluated and we confirmed how these errors affect to printing performance.
Phase-shifting point diffraction interferometer grating designs
Naulleau, Patrick; Goldberg, Kenneth Alan; Tejnil, Edita
2001-01-01
In a phase-shifting point diffraction interferometer, by sending the zeroth-order diffraction to the reference pinhole of the mask and the first-order diffraction to the test beam window of the mask, the test and reference beam intensities can be balanced and the fringe contrast improved. Additionally, using a duty cycle of the diffraction grating other than 50%, the fringe contrast can also be improved.
Green binary and phase shifting mask
NASA Astrophysics Data System (ADS)
Shy, S. L.; Hong, Chao-Sin; Wu, Cheng-San; Chen, S. J.; Wu, Hung-Yu; Ting, Yung-Chiang
2009-12-01
SixNy/Ni thin film green mask blanks were developed , and are now going to be used to replace general chromium film used for binary mask as well as to replace molydium silicide embedded material for AttPSM for I-line (365 nm), KrF (248 nm), ArF (193 nm) and Contact/Proximity lithography. A bilayer structure of a 1 nm thick opaque, conductive nickel layer and a SixNy layer is proposed for binary and phase-shifting mask. With the good controlling of plasma CVD of SixNy under silane (50 sccm), ammonia (5 sccm) and nitrogen (100 sccm), the pressure is 250 mTorr. and RF frequency 13.56 MHz and power 50 W. SixNy has enough deposition latitude to meet the requirements as an embedded layer for required phase shift 180 degree, and the T% in 193, 248 and 365 nm can be adjusted between 2% to 20% for binary and phase shifting mask usage. Ni can be deposited by E-gun, its sheet resistance Rs is less than 1.435 kΩ/square. Jeol e-beam system and I-line stepper are used to evaluate these thin film green mask blanks, feature size less than 200 nm half pitch pattern and 0.558 μm pitch contact hole can be printed. Transmission spectrums of various thickness of SixNy film are inspected by using UV spectrometer and FTIR. Optical constants of the SixNy film are measured by n & k meter and surface roughness is inspected by using Atomic Force Microscope (AFM).
Phase-shifting point diffraction interferometer focus-aid enhanced mask
Naulleau, Patrick
2000-01-01
A phase-shifting point diffraction interferometer system (PS/PDI) employing a PS/PDI mask that includes a PDI focus aid is provided. The PDI focus aid mask includes a large or secondary reference pinhole that is slightly displaced from the true or primary reference pinhole. The secondary pinhole provides a larger capture tolerance for interferometrically performing fine focus. With the focus-aid enhanced mask, conventional methods such as the knife-edge test can be used to perform an initial (or rough) focus and the secondary (large) pinhole is used to perform interferometric fine focus. Once the system is well focused, high accuracy interferometry can be performed using the primary (small) pinhole.
Photomask etch system and process for 10nm technology node and beyond
NASA Astrophysics Data System (ADS)
Chandrachood, Madhavi; Grimbergen, Michael; Yu, Keven; Leung, Toi; Tran, Jeffrey; Chen, Jeff; Bivens, Darin; Yalamanchili, Rao; Wistrom, Richard; Faure, Tom; Bartlau, Peter; Crawford, Shaun; Sakamoto, Yoshifumi
2015-10-01
While the industry is making progress to offer EUV lithography schemes to attain ultimate critical dimensions down to 20 nm half pitch, an interim optical lithography solution to address an immediate need for resolution is offered by various integration schemes using advanced PSM (Phase Shift Mask) materials including thin e-beam resist and hard mask. Using the 193nm wavelength to produce 10nm or 7nm patterns requires a range of optimization techniques, including immersion and multiple patterning, which place a heavy demand on photomask technologies. Mask schemes with hard mask certainly help attain better selectivity and hence better resolution but pose integration challenges and defectivity issues. This paper presents a new photomask etch solution for attenuated phase shift masks that offers high selectivity (Cr:Resist > 1.5:1), tighter control on the CD uniformity with a 3sigma value approaching 1 nm and controllable CD bias (5-20 nm) with excellent CD linearity performance (<5 nm) down to the finer resolution. The new system has successfully demonstrated capability to meet the 10 nm node photomask CD requirements without the use of more complicated hard mask phase shift blanks. Significant improvement in post wet clean recovery performance was demonstrated by the use of advanced chamber materials. Examples of CD uniformity, linearity, and minimum feature size, and etch bias performance on 10 nm test site and production mask designs will be shown.
Modeling high-efficiency extreme ultraviolet etched multilayer phase-shift masks
NASA Astrophysics Data System (ADS)
Sherwin, Stuart; Neureuther, Andrew; Naulleau, Patrick
2017-10-01
Achieving high-throughput extreme ultraviolet (EUV) patterning remains a major challenge due to low source power; phase-shift masks can help solve this challenge for dense features near the resolution limit by creating brighter images than traditional absorber masks when illuminated with the same source power. We explore applications of etched multilayer phase-shift masks for EUV lithography, both in the current-generation 0.33 NA and next-generation 0.55 NA systems. We derive analytic formulas for the thin-mask throughput gains, which are 2.42× for lines and spaces and 5.86× for contacts compared with an absorber mask with dipole and quadrupole illumination, respectively. Using rigorous finite-difference time-domain simulations, we quantify variations in these gains by pitch and orientation, finding 87% to 113% of the thin-mask value for lines and spaces and a 91% to 99% for contacts. We introduce an edge placement error metric, which accounts for CD errors, relative feature motion, and telecentricity errors, and use this metric both to optimize mask designs for individual features and to explore which features can be printed on the same mask. Furthermore, we find that although partial coherence shrinks the process window, at an achievable sigma of 0.2 we obtain a depth of focus of 340 nm and an exposure latitude of 39.2%, suggesting that partial coherence will not limit the feasibility of this technology. Finally, we show that many problems such as sensitivity to etch uniformity can be greatly mitigated using a central obscuration in the imaging pupil.
Bright-light mask treatment of delayed sleep phase syndrome.
Cole, Roger J; Smith, Julian S; Alcalá, Yvonne C; Elliott, Jeffrey A; Kripke, Daniel F
2002-02-01
We treated delayed sleep phase syndrome (DSPS) with an illuminated mask that provides light through closed eyelids during sleep. Volunteers received either bright white light (2,700 lux, n = 28) or dim red light placebo (0.1 lux, n = 26) for 26 days at home. Mask lights were turned on (< 0.01 lux) 4 h before arising, ramped up for 1 h, and remained on at full brightness until arising. Volunteers also attempted to systematically advance sleep time, avoid naps, and avoid evening bright light. The light mask was well tolerated and produced little sleep disturbance. The acrophase of urinary 6-sulphatoxymelatonin (6-SMT) excretion advanced significantly from baseline in the bright group (p < 0.0006) and not in the dim group, but final phases were not significantly earlier in the bright group (ANCOVA ns). Bright treatment did produce significantly earlier phases, however, among volunteers whose baseline 6-SMT acrophase was later than the median of 0602 h (bright shift: 0732-0554 h, p < 0.0009; dim shift: 0746-0717 h, ns; ANCOVA p = 0.03). In this subgroup, sleep onset advanced significantly only with bright but not dim treatment (sleep onset shift: bright 0306-0145 h, p < 0.0002; dim 0229-0211 h, ns; ANCOVA p < .05). Despite equal expectations at baseline, participants rated bright treatment as more effective than dim treatment (p < 0.04). We conclude that bright-light mask treatment advances circadian phase and provides clinical benefit in DSPS individuals whose initial circadian delay is relatively severe.
Clean induced feature CD shift of EUV mask
NASA Astrophysics Data System (ADS)
Nesládek, Pavel; Schedel, Thorsten; Bender, Markus
2016-05-01
EUV developed in the last decade to the most promising <7nm technology candidate. Defects are considered to be one of the most critical issues of the EUV mask. There are several contributors which make the EUV mask so different from the optical one. First one is the significantly more complicated mask stack consisting currently of 40 Mo/Si double layers, covered by Ru capping layer and TaN/TaO absorber/anti-reflective coating on top of the front face of the mask. Backside is in contrary to optical mask covered as well by conductive layer consisting of Cr or CrN. Second contributor is the fact that EUV mask is currently in contrary to optical mask not yet equipped with sealed pellicle, leading to much higher risk of mask contamination. Third reason is use of EUV mask in vacuum, possibly leading to deposition of vacuum contaminants on the EUV mask surface. Latter reason in combination with tight requirements on backside cleanliness lead to the request of frequent recleaning of the EUV mask, in order to sustain mask lifetime similar to that of optical mask. Mask cleaning process alters slightly the surface of any mask - binary COG mask, as well as phase shift mask of any type and naturally also of the EUV mask as well. In case of optical masks the changes are almost negligible, as the mask is exposed to max. 10-20 re-cleans within its life time. These modifications can be expressed in terms of different specified parameters, e.g. CD shift, phase/trans shift, change of the surface roughness etc. The CD shift, expressed as thinning (or exceptionally thickening) of the dark features on the mask is typically in order of magnitude 0.1nm per process run, which is completely acceptable for optical mask. Projected on the lifetime of EUV mask, assuming 100 clean process cycles, this will lead to CD change of about 10nm. For this reason the requirements for EUV mask cleaning are significantly tighter, << 0.1 nm per process run. This task will look even more challenging, when considering, that the tools for CD measurement at the EUV mask are identical as for optical mask. There is one aspect influencing the CD shift, which demands attention. The mask composition of the EUV mask is significantly different from the optical mask. More precisely there are 2 materials influencing the estimated CD in case of EUV mask, whereas there is one material only in case of optical masks, in first approximation. For optical masks, the CD changes can be attributed to modification of the absorber/ARC layer, as the quartz substrate can be hardly modified by the wet process. For EUV Masks chemical modification of the Ru capping layer - thinning, oxidization etc. are rather more probable and we need to take into account, how this effects can influence the CD measurement process. CD changes measured can be interpreted as either change in the feature size, or modification of the chemical nature of both absorber/ARC layer stack and the Ru capping layer. In our work we try to separate the effect of absorber and Ru/capping layer on the CD shift observed and propose independent way of estimation both parameters.
Attenuated phase-shift mask (PSM) blanks for flat panel display
NASA Astrophysics Data System (ADS)
Kageyama, Kagehiro; Mochizuki, Satoru; Yamakawa, Hiroyuki; Uchida, Shigeru
2015-10-01
The fine pattern exposure techniques are required for Flat Panel display applications as smart phone, tablet PC recently. The attenuated phase shift masks (PSM) are being used for ArF and KrF photomask lithography technique for high end pattern Semiconductor applications. We developed CrOx based large size PSM blanks that has good uniformity on optical characteristics for FPD applications. We report the basic optical characteristics and uniformity, stability data of large sized CrOx PSM blanks.
Diffractive phase-shift lithography photomask operating in proximity printing mode.
Cirino, Giuseppe A; Mansano, Ronaldo D; Verdonck, Patrick; Cescato, Lucila; Neto, Luiz G
2010-08-02
A phase shift proximity printing lithographic mask is designed, manufactured and tested. Its design is based on a Fresnel computer-generated hologram, employing the scalar diffraction theory. The obtained amplitude and phase distributions were mapped into discrete levels. In addition, a coding scheme using sub-cells structure was employed in order to increase the number of discrete levels, thus increasing the degree of freedom in the resulting mask. The mask is fabricated on a fused silica substrate and an amorphous hydrogenated carbon (a:C-H) thin film which act as amplitude modulation agent. The lithographic image is projected onto a resist coated silicon wafer, placed at a distance of 50 microm behind the mask. The results show a improvement of the achieved resolution--linewidth as good as 1.5 microm--what is impossible to obtain with traditional binary masks in proximity printing mode. Such achieved dimensions can be used in the fabrication of MEMS and MOEMS devices. These results are obtained with a UV laser but also with a small arc lamp light source exploring the partial coherence of this source.
Actinic imaging and evaluation of phase structures on EUV lithography masks
DOE Office of Scientific and Technical Information (OSTI.GOV)
Mochi, Iacopo; Goldberg, Kenneth; Huh, Sungmin
2010-09-28
The authors describe the implementation of a phase-retrieval algorithm to reconstruct phase and complex amplitude of structures on EUV lithography masks. Many native defects commonly found on EUV reticles are difficult to detect and review accurately because they have a strong phase component. Understanding the complex amplitude of mask features is essential for predictive modeling of defect printability and defect repair. Besides printing in a stepper, the most accurate way to characterize such defects is with actinic inspection, performed at the design, EUV wavelength. Phase defect and phase structures show a distinct through-focus behavior that enables qualitative evaluation of themore » object phase from two or more high-resolution intensity measurements. For the first time, phase of structures and defects on EUV masks were quantitatively reconstructed based on aerial image measurements, using a modified version of a phase-retrieval algorithm developed to test optical phase shifting reticles.« less
Ultra narrow flat-top filter based on multiple equivalent phase shifts
NASA Astrophysics Data System (ADS)
Wang, Fei; Zou, Xihua; Yin, Zuowei; Chen, Xiangfei; Shen, Haisong
2008-11-01
Instead of real phase shifts, equivalent phase shifts (EPS) are adopted to construct ultra narrow phase-shifted band-pass filer in sampled Bragg gratings (SBG). Two optimized distributions of multiple equivalent phase shifts, using 2 and 5 EPSs respectively, are given in this paper to realize flat-top and ripple-free transmission characteristics simultaneously. Also two demonstrations with 5 EPSs both on hydrogen-loaded and photosensitive fibers are presented and their spectrums are examined by an optical vector analyzer (OVA). Given only ordinary phase mask and sub-micrometer precision control, ultra-narrowband flat-top filters with expected performance can be achieved flexibly and cost-effectively.
Hearing Sensitivity to Shifts of Rippled-Spectrum Sound Signals in Masking Noise.
Nechaev, Dmitry I; Milekhina, Olga N; Supin, Alexander Ya
2015-01-01
The goal of the study was to enlarge knowledge of discrimination of complex sound signals by the auditory system in masking noise. For that, influence of masking noise on detection of shift of rippled spectrum was studied in normal listeners. The signal was a shift of ripple phase within a 0.5-oct wide rippled spectrum centered at 2 kHz. The ripples were frequency-proportional (throughout the band, ripple spacing was a constant proportion of the ripple center frequency). Simultaneous masker was a 0.5-oct noise below-, on-, or above the signal band. Both the low-frequency (center frequency 1 kHz) and on-frequency (the same center frequency as for the signal) maskers increased the thresholds for detecting ripple phase shift. However, the threshold dependence on the masker level was different for these two maskers. For the on-frequency masker, the masking effect primarily depended on the masker/signal ratio: the threshold steeply increased at a ratio of 5 dB, and no shift was detectable at a ratio of 10 dB. For the low-frequency masker, the masking effect primarily depended on the masker level: the threshold increased at a masker level of 80 dB SPL, and no shift was detectable at a masker level of 90 dB (for a signal level of 50 dB) or 100 dB (for a signal level of 80 dB). The high-frequency masker had little effect. The data were successfully simulated using an excitation-pattern model. In this model, the effect of the on-frequency masker appeared to be primarily due to a decrease of ripple depth. The effect of the low-frequency masker appeared due to widening of the auditory filters at high sound levels.
Hearing Sensitivity to Shifts of Rippled-Spectrum Sound Signals in Masking Noise
Nechaev, Dmitry I.; Milekhina, Olga N.; Supin, Alexander Ya.
2015-01-01
The goal of the study was to enlarge knowledge of discrimination of complex sound signals by the auditory system in masking noise. For that, influence of masking noise on detection of shift of rippled spectrum was studied in normal listeners. The signal was a shift of ripple phase within a 0.5-oct wide rippled spectrum centered at 2 kHz. The ripples were frequency-proportional (throughout the band, ripple spacing was a constant proportion of the ripple center frequency). Simultaneous masker was a 0.5-oct noise below-, on-, or above the signal band. Both the low-frequency (center frequency 1 kHz) and on-frequency (the same center frequency as for the signal) maskers increased the thresholds for detecting ripple phase shift. However, the threshold dependence on the masker level was different for these two maskers. For the on-frequency masker, the masking effect primarily depended on the masker/signal ratio: the threshold steeply increased at a ratio of 5 dB, and no shift was detectable at a ratio of 10 dB. For the low-frequency masker, the masking effect primarily depended on the masker level: the threshold increased at a masker level of 80 dB SPL, and no shift was detectable at a masker level of 90 dB (for a signal level of 50 dB) or 100 dB (for a signal level of 80 dB). The high-frequency masker had little effect. The data were successfully simulated using an excitation-pattern model. In this model, the effect of the on-frequency masker appeared to be primarily due to a decrease of ripple depth. The effect of the low-frequency masker appeared due to widening of the auditory filters at high sound levels. PMID:26462066
Jeon, Seokwoo; Shir, Daniel J.; Nam, Yun Suk; ...
2007-05-08
This paper introduces approaches that combine micro/nanomolding, or nanoimprinting, techniques with proximity optical phase mask lithographic methods to form three dimensional (3D) nanostructures in thick, transparent layers of photopolymers. The results demonstrate three strategies of this type, where molded relief structures in these photopolymers represent (i) fine (<1 μm) features that serve as the phase masks for their own exposure, (ii) coarse features (>1 μm) that are used with phase masks to provide access to large structure dimensions, and (iii) fine structures that are used together phase masks to achieve large, multilevel phase modulations. Several examples are provided, together withmore » optical modeling of the fabrication process and the transmission properties of certain of the fabricated structures. Lastly, these approaches provide capabilities in 3D fabrication that complement those of other techniques, with potential applications in photonics, microfluidics, drug delivery and other areas.« less
OPC and PSM design using inverse lithography: a nonlinear optimization approach
NASA Astrophysics Data System (ADS)
Poonawala, Amyn; Milanfar, Peyman
2006-03-01
We propose a novel method for the fast synthesis of low complexity model-based optical proximity correction (OPC) and phase shift masks (PSM) to improve the resolution and pattern fidelity of optical microlithography. We use the pixel-based mask representation, a continuous function formulation, and gradient based iterative optimization techniques to solve the above inverse problem. The continuous function formulation allows analytic calculation of the gradient. Pixel-based parametrization provides tremendous liberty in terms of the features possible in the synthesized masks, but also suffers the inherent disadvantage that the masks are very complex and difficult to manufacture. We therefore introduce the regularization framework; a useful tool which provides the flexibility to promote certain desirable properties in the solution. We employ the above framework to ensure that the estimated masks have only two or three (allowable) transmission values and are also comparatively simple and easy to manufacture. The results demonstrate that we are able to bring the CD on target using OPC masks. Furthermore, we were also able to boost the contrast of the aerial image using attenuated, strong, and 100% transmission phase shift masks. Our algorithm automatically (and optimally) adds assist-bars, dog-ears, serifs, anti-serifs, and other custom structures best suited for printing the desired pattern.
Vajtay, Thomas J; St Thomas, Jeremy J; Takacs, Tyrus E; McGann, Eric G; Weber, E Todd
2017-10-01
Photic entrainment of the murine circadian system can typically be explained with a discrete model in which light exposures near dusk and dawn can either advance or delay free-running rhythms to match the external light cycle period. In most mouse strains, the magnitude of those phase shifts is limited to several hours per day; however, the BALB/cJ mouse can re-entrain to large (6-8hour) phase advances of the light/dark cycle. In this study, we demonstrate that the circadian responses of BALB/cJ mice are dependent on duration as well as timing of light exposure, with significantly larger phase shifts resulting from >6-hour light exposures, yet loss of entrainment to photoperiods of <2-3hours per day or to skeleton photoperiods. Intermittent light exposures of the same total duration but distributed differentially over the same period of time as that of a 6-hour phase advance of the light cycle yielded phase shifts of different magnitudes depending on the pattern of exposure. Both negative and positive masking responses to light and darkness, respectively, were exaggerated in BALB/cJ mice under a T7 light cycle, but were not responsible for their rapid re-entrainment to chronic phase shifting of the light dark cycle. These results collectively suggest that the innately jetlag-resistant BALB/cJ mouse circadian system provides an alternative murine model in which to elucidate the limitations of photic entrainment observed in other commonly used strains of mice. Copyright © 2017 Elsevier Inc. All rights reserved.
Polarization masks: concept and initial assessment
NASA Astrophysics Data System (ADS)
Lam, Michael; Neureuther, Andrew R.
2002-07-01
Polarization from photomasks can be used as a new lever to improve lithographic performance in both binary and phase-shifting masks (PSMs). While PSMs manipulate the phase of light to control the temporal addition of electric field vectors, polarization masks manipulate the vector direction of electric field vectors to control the spatial addition of electric field components. This paper explores the theoretical possibilities of polarization masks, showing that it is possible to use bar structures within openings on the mask itself to polarize incident radiation. Rigorous electromagnetic scattering simulations using TEMPEST and imaging with SPLAT are used to give an initial assessment on the functionality of polarization masks, discussing the polarization quality and throughputs achieved with the masks. Openings between 1/8 and 1/3 of a wavelength provide both a low polarization ratio and good transmission. A final overall throughput of 33% - 40% is achievable, corresponding to a dose hit of 2.5x - 3x.
NASA Astrophysics Data System (ADS)
Hansen, Matthew E.; Cerrina, Franco
1994-05-01
A high-sensitivity holographic and interferometric metrology developed at the Center for X- ray Lithography (CXrL) has been employed to investigate in-plane distortions (IPD) produced in x-ray mask materials. This metrology has been applied to characterize damage to x-ray mask materials exposed to synchrotron radiation. X-ray mask damage and accelerated mask damage studies on silicon nitride and silicon carbide were conducted on the Aladdin ES-1 and ES-2 beamline exposure stations, respectively. Accumulated in-plane distortions due to x-ray irradiation were extracted from the incremental interferometric phase maps to yield IPD vs. dose curves for silicon nitride mask blanks. Silicon carbide mask blanks were subjected to accelerated mask damage in the high flux 2 mm X 2 mm beam of the ES-2 exposure station. An accelerated damage study of silicon carbide has shown no in-plane distortion for an accumulated dose of 800 kJ/cm2 with a measurement sensitivity of less than 5 nm.
Alternative method for variable aspect ratio vias using a vortex mask
NASA Astrophysics Data System (ADS)
Schepis, Anthony R.; Levinson, Zac; Burbine, Andrew; Smith, Bruce W.
2014-03-01
Historically IC (integrated circuit) device scaling has bridged the gap between technology nodes. Device size reduction is enabled by increased pattern density, enhancing functionality and effectively reducing cost per chip. Exemplifying this trend are aggressive reductions in memory cell sizes that have resulted in systems with diminishing area between bit/word lines. This affords an even greater challenge in the patterning of contact level features that are inherently difficult to resolve because of their relatively small area and complex aerial image. To accommodate these trends, semiconductor device design has shifted toward the implementation of elliptical contact features. This empowers designers to maximize the use of free device space, preserving contact area and effectively reducing the via dimension just along a single axis. It is therefore critical to provide methods that enhance the resolving capacity of varying aspect ratio vias for implementation in electronic design systems. Vortex masks, characterized by their helically induced propagation of light and consequent dark core, afford great potential for the patterning of such features when coupled with a high resolution negative tone resist system. This study investigates the integration of a vortex mask in a 193nm immersion (193i) lithography system and qualifies its ability to augment aspect ratio through feature density using aerial image vector simulation. It was found that vortex fabricated vias provide a distinct resolution advantage over traditionally patterned contact features employing a 6% attenuated phase shift mask (APM). 1:1 features were resolvable at 110nm pitch with a 38nm critical dimension (CD) and 110nm depth of focus (DOF) at 10% exposure latitude (EL). Furthermore, iterative source-mask optimization was executed as means to augment aspect ratio. By employing mask asymmetries and directionally biased sources aspect ratios ranging between 1:1 and 2:1 were achievable, however, this range is ultimately dictated by pitch employed.
Applications of CPL mask technology for sub-65nm gate imaging
NASA Astrophysics Data System (ADS)
Litt, Lloyd C.; Conley, Will; Wu, Wei; Peters, Richie; Parker, Colita; Cobb, Jonathan; Kasprowicz, Bryan S.; van den Broeke, Doug; Park, J. C.; Karur-Shanmugam, Ramkumar
2005-05-01
The requirements for critical dimension control on gate layer for high performance products are increasingly demanding. Phase shift techniques provide aerial image enhancement, which can translate into improved process window performance and greater critical dimension (CD) control if properly applied. Unfortunately, the application of hard shifter technology to production requires significant effort in layout and optical proximity correction (OPC) application. Chromeless Phase Lithography (CPL) has several advantages over complementary phase mask (c:PSM) such as use of a single mask, and lack of phase placement 'coloring' conflicts and phase imbalance issues. CPL does have implementation issues that must be resolved before it can be used in full-scale production. CPL mask designs can be approached by separating features into three zones based on several parameters, including size relative to the lithographic resolution of the stepper lens, wavelength, and illumination conditions defined. Features are placed into buckets for different treatment zones. Zone 1 features are constructed with 100% transmission phase shifted structures and Zone 3 features are chrome (binary) structures. Features that fall into Zone 2, which are too wide to be defined using the 100% transmission of pure CPL (i.e. have negative mask error factor, MEEF) are the most troublesome and can be approached in several ways. The authors have investigated the application of zebra structures of various sizes to product type layouts. Previous work to investigate CPL using test structures set the groundwork for the more difficult task of applying CPL rules to actual random logic design layouts, which include many zone transitions. Mask making limitations have been identified that play a role in the zebra sizing that can be applied to Zone 2 features. The elimination of Zone 2 regions was also investigated in an effort to simplify the application of CPL and improve manufacturability of reticle through data enhancements.
Lin, Jingquan; Weber, Nils; Escher, Matthias; Maul, Jochen; Han, Hak-Seung; Merkel, Michael; Wurm, Stefan; Schönhense, Gerd; Kleineberg, Ulf
2008-09-29
A photoemission electron microscope based on a new contrast mechanism "interference contrast" is applied to characterize extreme ultraviolet lithography mask blank defects. Inspection results show that positioning of interference destructive condition (node of standing wave field) on surface of multilayer in the local region of a phase defect is necessary to obtain best visibility of the defect on mask blank. A comparative experiment reveals superiority of the interference contrast photoemission electron microscope (Extreme UV illumination) over a topographic contrast one (UV illumination with Hg discharge lamp) in detecting extreme ultraviolet mask blank phase defects. A depth-resolved detection of a mask blank defect, either by measuring anti-node peak shift in the EUV-PEEM image under varying inspection wavelength condition or by counting interference fringes with a fixed illumination wavelength, is discussed.
NASA Astrophysics Data System (ADS)
McIntyre, Gregory Russell
The primary objective of this dissertation is to develop the phase shifting mask (PSM) as a precision instrument to characterize effects in optical lithography related to the use of polarized partially coherent illumination. The intent is to provide an in-situ characterization technique to add to the lithographer's tool-kit to help enable the stable and repeatable mass production of integrated circuits with feature sizes approaching 1/6th the wavelength of light being used. A series of complex-valued mathematical functions have been derived from basic principles and recent advances in photomask fabrication technology have enabled their implementation with four-phase mask making. When located in the object plane of an imaging system, these test functions serve to engineer a wavefiront that interacts with one particular optical effect, creating a measurable signal in the image plane. In most cases, these test patterns leverage proximity effects to create a central image intensity and are theoretically the most sensitive to the desired effect. Five novel classes of test patterns have been developed for in-situ characterization. The first two classes, The Linear Phase Grating (LPG) and Linear Phase Ring (LPR), both serve to characterize illumination angular distribution and uniformity by creating signals dependent on illumination angular frequency. The third class consists of the Radial Phase Grating (RPG) and Proximity Effect Polarization Analyzers (PEPA), which each create a polarization-dependent signal by taking advantage of the image reversal of one polarization component at high numerical aperture (NA). PSM Polarimetry employs a series of these patterns to form a complete polarization characterization of any arbitrary illumination scheme. The fourth and fifth classes employ sub-resolution interferometric reference probes to coherently interact with proximity effect spillover from a surrounding pattern. They measure the effective phase and transmission of the shifted regions of an alternating PSM and projection lens birefringence, respectively. A secondary objective of this dissertation has been to leverage some of these functions to extend the application of pattern matching software to rapidly identify areas in a circuit design layout that may be vulnerable to polarization and high-NA effects. Additionally, polarization aberrations have been investigated, as they may become important with hyper-NA imaging systems. Three multi-phase test reticles have been developed for this thesis and have pushed the limits of photomask fabrication. Coupled with a variety of experimental and simulation studies at 193nm wavelength, they have validated the scientific principles of the PSM monitors and have offered unique insight into implementation issues such as electromagnetic (EM) effects and mask making tolerances. Although all five classes are novel theoretical concepts, it is believed that PSM Polarimetry is commercially viable. Despite a 70% loss of sensitivity due to mask making limitations and a 20% loss due to EM effects, it can likely still monitor polarization to within 2%. Experimental results are comparable to the only other known technique, which requires special equipment. Taken collectively, the five novel classes of PSM monitors offer the lithographer an independent tool-kit to ensure proper tool operation. They also provide circuit designers an understanding of the impact of imaging on layouts. Although they have been developed for optical lithography, their principles are relevant to any image-forming optical system and are likely to find applications in other fields of optics or acoustics.
Micropatterned photoalignment for wavefront controlled switchable optical devices
NASA Astrophysics Data System (ADS)
Glazar, Nikolaus
Photoalignment is a well-established technique for surface alignment of the liquid crystal director. Previously, chrome masks were necessary for patterned photoalignment but were difficult to use, costly, and inflexible. To extend the capabilities of photoalignment we built an automated maskless multi-domain photoalignment device based on a DMD (digital multimirror device) projection system. The device is capable of creating arbitrary photoalignment patterns with micron-sized features. Pancharatnam-Berry phase (PB-phase) is a geometric phase that arises from cyclic change of polarization state. By varying the azimuthal anchoring angle in a hybrid-aligned liquid crystal cell we can control the spatial variation of the PB-phase shift. Using our automated photoalignment device to align the liquid crystal arbitrary wave front manipulations are possible. The PB-phase shift effect is maximized when the cell is tuned to have a half-wave retardation and disappears at full-wave retardation, so the cell can be switched on and off by applying a voltage. Two wavefront controlled devices developed using this technique will be discussed: A switchable liquid crystal phase shift mask for creating sub-diffraction sized photolithographic features, and a transparent diffractive display that utilizes a switchable liquid crystal diffraction grating.
NASA Astrophysics Data System (ADS)
Lin, Cheng-ming; Chang, Keh-wen; Lee, Ming-der; Loong, Wen-An
1999-07-01
Abstract-Five materials which are PdSixOy, CrAlxOy, SiNx, TiSixNy, and TiSixOyNz as absorptive shifters for attenuated phase-shifting mask in 193 nm wavelength lithography are presented. PdSixOy films were deposited by dual e-gun evaporation. CrAlxOy, TiSixNy and TiSixOyNz films were formed by plasma sputtering and SiNx films were formed with LPCVD. All of these materials are shown to be capable of achieving 4 percent - 15 percent transmittance in 193 nm with thickness that produce a 180 degrees phase shift. Under BCl3:Cl2 equals 14:70 sccm; chamber pressure 5 mtorr and RF power 1900W, the dry etching selectivity of TiSixNy over DQN positive resist and fused silica, were found to be 2:1 and 4,8:1 respectively. An embedded layer TiSixNy with 0.5 micrometers line/space was successfully patterned.
NASA Astrophysics Data System (ADS)
Mamezaki, Daiki; Harada, Tetsuo; Nagata, Yutaka; Watanabe, Takeo
2017-07-01
In extreme ultraviolet (EUV) lithography, development of review tools for EUV mask pattern and phase defect at working wavelength of 13.5 nm is required. The EUV mask is composed of an absorber pattern (50 - 70 nm thick) and Mo/Si multilayer (280 nm thick) on a glass substrate. This mask pattern seems three-dimensional (3D) structure. This 3D structure would modulate EUV reflection phase, which would cause focus and pattern shifts. Thus, EUV phase imaging is important to evaluate this phase modulation. We have developed coherent EUV scatterometry microscope (CSM), which is a simple microscope without objective optics. EUV phase and intensity image are reconstructed with diffraction images by ptychography with coherent EUV illumination. The high-harmonic-generation (HHG) EUV source was employed for standalone CSM system. In this study, we updated HHG system of pump-laser reduction and gas-pressure control. Two types of EUV mask absorber patterns were observed. An 88-nm lines-and-spaces and a cross-line patterns were clearly reconstructed by ptychography. In addition, a natural defect with 2-μm diameter on the cross-line was well reconstructed. This demonstrated the high capability of the standalone CSM, which system will be used in the factories, such as mask shops and semiconductor fabrication plants.
NASA Astrophysics Data System (ADS)
Hector, Scott
2005-11-01
The extension of optical projection lithography through immersion to patterning features with half pitch <=65 nm is placing greater demands on the mask. Strong resolution enhancement techniques (RETs), such as embedded and alternating phase shift masks and complex model-based optical proximity correction, are required to compensate for diffraction and limited depth of focus (DOF). To fabricate these masks, many new or upgraded tools are required to write patterns, measure feature sizes and placement, inspect for defects, review defect printability and repair defects on these masks. Beyond the significant technical challenges, suppliers of mask fabrication equipment face the challenge of being profitable in the small market for mask equipment while encountering significant R&D expenses to bring new generations of mask fabrication equipment to market. The total available market for patterned masks is estimated to be $2.5B to $2.9B per year. The patterned mask market is about 20% of the market size for lithography equipment and materials. The total available market for mask-making equipment is estimated to be about $800M per year. The largest R&D affordability issue arises for the makers of equipment for fabricating masks where total available sales are typically less than ten units per year. SEMATECH has used discounted cash flow models to predict the affordable R&D while maintaining industry accepted internal rates of return. The results have been compared to estimates of the total R&D cost to bring a new generation of mask equipment to market for various types of tools. The analysis revealed that affordability of the required R&D is a significant problem for many suppliers of mask-making equipment. Consortia such as SEMATECH and Selete have played an important role in cost sharing selected mask equipment and material development projects. Governments in the United States, in Europe and in Japan have also helped equipment suppliers with support for R&D. This paper summarizes the challenging business model for mask equipment suppliers and highlight government support for mask equipment and materials development.
ArF halftone PSM cleaning process optimization for next-generation lithography
NASA Astrophysics Data System (ADS)
Son, Yong-Seok; Jeong, Seong-Ho; Kim, Jeong-Bae; Kim, Hong-Seok
2000-07-01
ArF lithography which is expected for the next generation optical lithography is adapted for 0.13 micrometers design-rule and beyond. ArF half-tone phase shift mask (HT PSM) will be applied as 1st generation of ArF lithography. Also ArF PSM cleaning demands by means of tighter controls related to phase angle, transmittance and contamination on the masks. Phase angle on ArF HT PSM should be controlled within at least +/- 3 degree and transmittance controlled within at least +/- 3 percent after cleaning process and pelliclization. In the cleaning process of HT PSM, requires not only the remove the particle on mask, but also control to half-tone material for metamorphosis. Contamination defects on the Qz of half tone type PSM is not easy to remove on the photomask surface. New technology and methods of cleaning will be developed in near future, but we try to get out for limit contamination on the mask, without variation of phase angle and transmittance after cleaning process.
Li, Jia; Lam, Edmund Y
2014-04-21
Mask topography effects need to be taken into consideration for a more accurate solution of source mask optimization (SMO) in advanced optical lithography. However, rigorous 3D mask models generally involve intensive computation and conventional SMO fails to manipulate the mask-induced undesired phase errors that degrade the usable depth of focus (uDOF) and process yield. In this work, an optimization approach incorporating pupil wavefront aberrations into SMO procedure is developed as an alternative to maximize the uDOF. We first design the pupil wavefront function by adding primary and secondary spherical aberrations through the coefficients of the Zernike polynomials, and then apply the conjugate gradient method to achieve an optimal source-mask pair under the condition of aberrated pupil. We also use a statistical model to determine the Zernike coefficients for the phase control and adjustment. Rigorous simulations of thick masks show that this approach provides compensation for mask topography effects by improving the pattern fidelity and increasing uDOF.
Dual-domain point diffraction interferometer
Naulleau, Patrick P.; Goldberg, Kenneth Alan
2000-01-01
A hybrid spatial/temporal-domain point diffraction interferometer (referred to as the dual-domain PS/PDI) that is capable of suppressing the scattered-reference-light noise that hinders the conventional PS/PDI is provided. The dual-domain PS/PDI combines the separate noise-suppression capabilities of the widely-used phase-shifting and Fourier-transform fringe pattern analysis methods. The dual-domain PS/PDI relies on both a more restrictive implementation of the image plane PS/PDI mask and a new analysis method to be applied to the interferograms generated and recorded by the modified PS/PDI. The more restrictive PS/PDI mask guarantees the elimination of spatial-frequency crosstalk between the signal and the scattered-light noise arising from scattered-reference-light interfering with the test beam. The new dual-domain analysis method is then used to eliminate scattered-light noise arising from both the scattered-reference-light interfering with the test beam and the scattered-reference-light interfering with the "true" pinhole-diffracted reference light. The dual-domain analysis method has also been demonstrated to provide performance enhancement when using the non-optimized standard PS/PDI design. The dual-domain PS/PDI is essentially a three-tiered filtering system composed of lowpass spatial-filtering the test-beam electric field using the more restrictive PS/PDI mask, bandpass spatial-filtering the individual interferogram irradiance frames making up the phase-shifting series, and bandpass temporal-filtering the phase-shifting series as a whole.
Novel fluoro copolymers for 157-nm photoresists: a progress report
NASA Astrophysics Data System (ADS)
Hohle, Christoph; Hien, Stefan; Eschbaumer, Christian; Rottstegge, Joerg; Sebald, Michael
2002-07-01
Several fluoro-substituted polymers consisting of acid cleavable methacryoic or cinnamic acid tert.-butyl ester compounds copolymerized with maleic acid anhydride derivatives were synthesized by radical copolymerization. Vacuum ultraviolet transmission measurements of the samples reveal absorbances down to 5micrometers -1 despite of the strongly absorbing anhydride moiety which serves as silylation anchor for the application of the Chemical Amplification of Resist Lines (CARL) process, one of the promising approaches for sub-90nm pattern fabrication. Some of the samples exhibit resolutions down to 110nm dense at 157nm exposure using an alternating phase shift mask. The feasibility of the CARL principle including the silylation reaction after development has been demonstrated with selected fluorinated polymer samples.
NASA Astrophysics Data System (ADS)
McIntyre, Gregory; Neureuther, Andrew; Slonaker, Steve; Vellanki, Venu; Reynolds, Patrick
2006-03-01
The initial experimental verification of a polarization monitoring technique is presented. A series of phase shifting mask patterns produce polarization dependent signals in photoresist and are capable of monitoring the Stokes parameters of any arbitrary illumination scheme. Experiments on two test reticles have been conducted. The first reticle consisted of a series of radial phase gratings (RPG) and employed special apertures to select particular illumination angles. Measurement sensitivities of about 0.3 percent of the clear field per percent change in polarization state were observed. The second test reticle employed the more sensitive proximity effect polarization analyzers (PEPA), a more robust experimental setup, and a backside pinhole layer for illumination angle selection and to enable characterization of the full illuminator. Despite an initial complication with the backside pinhole alignment, the results correlate with theory. Theory suggests that, once the pinhole alignment is corrected in the near future, the second reticle should achieve a measurement sensitivity of about 1 percent of the clear field per percent change in polarization state. This corresponds to a measurement of the Stokes parameters after test mask calibration, to within about 0.02 to 0.03. Various potential improvements to the design, fabrication of the mask, and experimental setup are discussed. Additionally, to decrease measurement time, a design modification and double exposure technique is proposed to enable electrical detection of the measurement signal.
NASA Astrophysics Data System (ADS)
Phan, Khoi A.; Spence, Chris A.; Dakshina-Murthy, S.; Bala, Vidya; Williams, Alvina M.; Strener, Steve; Eandi, Richard D.; Li, Junling; Karklin, Linard
1999-12-01
As advanced process technologies in the wafer fabs push the patterning processes toward lower k1 factor for sub-wavelength resolution printing, reticles are required to use optical proximity correction (OPC) and phase-shifted mask (PSM) for resolution enhancement. For OPC/PSM mask technology, defect printability is one of the major concerns. Current reticle inspection tools available on the market sometimes are not capable of consistently differentiating between an OPC feature and a true random defect. Due to the process complexity and high cost associated with the making of OPC/PSM reticles, it is important for both mask shops and lithography engineers to understand the impact of different defect types and sizes to the printability. Aerial Image Measurement System (AIMS) has been used in the mask shops for a number of years for reticle applications such as aerial image simulation and transmission measurement of repaired defects. The Virtual Stepper System (VSS) provides an alternative method to do defect printability simulation and analysis using reticle images captured by an optical inspection or review system. In this paper, pre- programmed defects and repairs from a Defect Sensitivity Monitor (DSM) reticle with 200 nm minimum features (at 1x) will be studied for printability. The simulated resist lines by AIMS and VSS are both compared to SEM images of resist wafers qualitatively and quantitatively using CD verification.Process window comparison between unrepaired and repaired defects for both good and bad repair cases will be shown. The effect of mask repairs to resist pattern images for the binary mask case will be discussed. AIMS simulation was done at the International Sematech, Virtual stepper simulation at Zygo and resist wafers were processed at AMD-Submicron Development Center using a DUV lithographic process for 0.18 micrometer Logic process technology.
Forest/Nonforest Classification of Landsat TM Data For Annual Inventory Phase One Stratification
Jim Rack
2001-01-01
Launch of Landsat 7 creates the opportunity to use relatively inexpensive and regularly acquired land cover data as an alternative to high altitude aerial photography. Creating a forest/nonforest mask from satellite imagery may offer a cost-effective alternative to interpretation of aerial photography for Phase One stratification of annual inventory plots. This paper...
Quartz 9-inch size mask blanks for ArF PSM (Phase Shift Mask)
NASA Astrophysics Data System (ADS)
Harashima, Noriyuki; Isozaki, Tatsuya; Kawanishi, Arata; Kanai, Shuichiro; Kageyama, Kagehiro; Iso, Hiroyuki; Chishima, Tatsuya
2017-07-01
Semiconductor technology nodes are steadily miniaturizing. On the other hand, various efforts have been made to reduce costs, mass production lines have shifted from 200 mmφ of Si wafer to 300 mmφ, and technology development of Si wafer 450 mmφ is also in progress. As a photomask, 6-inch size binary Cr mask has been used for many years, but in recent years, the use of 9-inch binary Cr masks for Proximity Lithography Process in automotive applications, MEMS, packages, etc. has increased, and cost reduction has been taken. Since the miniaturization will progress in the above applications in the future, products corresponding to miniaturization are also desired in 9-inch photomasks. The high grade Cr - binary mask blanks used in proximity exposure process, there is a prospect of being able to use it by ULVAC COATING CORPORATION's tireless research. As further demands for miniaturization, KrF and ArF Lithography Process, which are used for steppers and scanners , there are also a demand for 9-inch size Mask Blanks. In ULVAC COATING CORPORATION, we developed a 9 - inch size KrF PSM mask Blanks prototype in 2016 and proposed a new high grade 9 - inch photomask. This time, we have further investigated and developed 9-inch size ArF PSM Mask Blanks corresponding to ArF Lithography Process, so we report it.
Optical image encryption using multilevel Arnold transform and noninterferometric imaging
NASA Astrophysics Data System (ADS)
Chen, Wen; Chen, Xudong
2011-11-01
Information security has attracted much current attention due to the rapid development of modern technologies, such as computer and internet. We propose a novel method for optical image encryption using multilevel Arnold transform and rotatable-phase-mask noninterferometric imaging. An optical image encryption scheme is developed in the gyrator transform domain, and one phase-only mask (i.e., phase grating) is rotated and updated during image encryption. For the decryption, an iterative retrieval algorithm is proposed to extract high-quality plaintexts. Conventional encoding methods (such as digital holography) have been proven vulnerably to the attacks, and the proposed optical encoding scheme can effectively eliminate security deficiency and significantly enhance cryptosystem security. The proposed strategy based on the rotatable phase-only mask can provide a new alternative for data/image encryption in the noninterferometric imaging.
Masking responses to light in period mutant mice.
Pendergast, Julie S; Yamazaki, Shin
2011-10-01
Masking is an acute effect of an external signal on an overt rhythm and is distinct from the process of entrainment. In the current study, we investigated the phase dependence and molecular mechanisms regulating masking effects of light pulses on spontaneous locomotor activity in mice. The circadian genes, Period1 (Per1) and Per2, are necessary components of the timekeeping machinery and entrainment by light appears to involve the induction of the expression of Per1 and Per2 mRNAs in the suprachiasmatic nuclei (SCN). We assessed the roles of the Per genes in regulating masking by assessing the effects of light pulses on nocturnal locomotor activity in C57BL/6J Per mutant mice. We found that Per1(-/-) and Per2(-/-) mice had robust negative masking responses to light. In addition, the locomotor activity of Per1(-/-)/Per2(-/-) mice appeared to be rhythmic in the light-dark (LD) cycle, and the phase of activity onset was advanced (but varied among individual mice) relative to lights off. This rhythm persisted for 1 to 2 days in constant darkness in some Per1(-/-)/Per2(-/-) mice. Furthermore, Per1(-/-)/Per2(-/-) mice exhibited robust negative masking responses to light. Negative masking was phase dependent in wild-type mice such that maximal suppression was induced by light pulses at zeitgeber time 14 (ZT14) and gradually weaker suppression occurred during light pulses at ZT16 and ZT18. By measuring the phase shifts induced by the masking protocol (light pulses were administered to mice maintained in the LD cycle), we found that the phase responsiveness of Per mutant mice was altered compared to wild-types. Together, our data suggest that negative masking responses to light are robust in Per mutant mice and that the Per1(-/-)/Per2(-/-) SCN may be a light-driven, weak/damping oscillator.
Multiproject wafers: not just for million-dollar mask sets
NASA Astrophysics Data System (ADS)
Morse, Richard D.
2003-06-01
With the advent of Reticle Enhancement Technologies (RET) such as Optical Proximity Correction (OPC) and Phase Shift Masks (PSM) required to manufacture semiconductors in the sub-wavelength era, the cost of photomask tooling has skyrocketed. On the leading edge of technology, mask set prices often exceed $1 million. This shifts an enormous burden back to designers and Electronic Design Automation (EDA) software vendors to create perfect designs at a time when the number of transistors per chip is measured in the hundreds of millions, and gigachips are on the drawing boards. Moore's Law has driven technology to incredible feats. The prime beneficiaries of the technology - memory and microprocessor (MPU) manufacturers - can continue to fit the model because wafer volumes (and chip prices in the MPU case) render tooling costs relatively insignificant. However, Application-Specific IC (ASIC) manufacturers and most foundry clients average very small wafer per reticle ratios causing a dramatic and potentially insupportable rise in the cost of manufacturing. Multi-Project wafers (MPWs) are a way to share the cost of tooling and silicon by putting more than one chip on each reticle. Lacking any unexpected breakthroughs in simulation, verification, or mask technology to reduce the cost of prototyping, more efficient use of reticle space becomes a viable and increasingly attractive choice. It is worthwhile therefore, to discuss the economics of prototyping in the sub-wavelength era and the increasing advantages of the MPW, shared-silicon approach. However, putting together a collection of different-sized chips during tapeout can be challenging and time consuming. Design compatibility, reticle field optimization, and frame generation have traditionally been the biggest worries but, with the advent of dummy-fill for planarization and RET for resolution, another layer of complexity has been added. MPW automation software is quite advanced today, but the size of the task dictates careful consideration of the alternative methods.
Manufacturing of ArF chromeless hard shifter for 65-nm technology
NASA Astrophysics Data System (ADS)
Park, Keun-Taek; Dieu, Laurent; Hughes, Greg P.; Green, Kent G.; Croffie, Ebo H.; Taravade, Kunal N.
2003-12-01
For logic design, Chrome-less Phase Shift Mask is one of the possible solutions for defining small geometry with low MEF (mask enhancement factor) for the 65nm node. There have been lots of dedicated studies on the PCO (Phase Chrome Off-axis) mask technology and several design approaches have been proposed including grating background, chrome patches (or chrome shield) for applying PCO on line/space and contact pattern. In this paper, we studied the feasibility of grating design for line and contact pattern. The design of the grating pattern was provided from the EM simulation software (TEMPEST) and the aerial image simulation software. AIMS measurements with high NA annular illumination were done. Resist images were taken on designed pattern in different focus. Simulations, AIMS are compared to verify the consistency of the process with wafer printed performance.
NASA Astrophysics Data System (ADS)
Mamezaki, Daiki; Harada, Tetsuo; Nagata, Yutaka; Watanabe, Takeo
2017-06-01
In extreme-ultraviolet (EUV) lithography, the development of a review apparatus for the EUV mask pattern at an exposure wavelength of 13.5 nm is required. The EUV mask is composed of an absorber pattern and a Mo/Si multilayer on a glass substrate. This mask pattern has a three-dimensional (3D) structure. The 3D structure would modulate the EUV reflection phase, which would cause focus and pattern shifts. Thus, the review of the EUV phase image is also important. We have developed a coherent EUV scatterometry microscope (CSM), which is a simple microscope without objective optics. The EUV phase and intensity images were reconstructed with diffraction images by ptychography. For a standalone mask review, the high-harmonic-generation (HHG) EUV source was employed. In this study, we updated the sample stage, pump-laser reduction system, and gas-pressure control system to reconstruct the image. As a result, an 88 nm line-and-space pattern and a cross-line pattern were reconstructed. In addition, a particle defect of 2 µm diameter was well reconstructed. This demonstrated the high capability of the standalone CSM, which can hence be used in factories, such as mask shops and semiconductor fabrication plants.
The effects of the photomask on multiphase shift test monitors
NASA Astrophysics Data System (ADS)
McIntyre, Gregory; Neureuther, Andrew
2006-10-01
A series of chromeless multiple-phase shift lithographic test monitors have been previously introduced. This paper investigates various effects that impact the performance of these monitors, focusing primarily on PSM Polarimetry, a technique to monitor illumination polarization. The measurement sensitivities from a variety of scalar and rigorous electromagnetic simulations are compared to experimental results from three industrial quality multi-phase test reticles. This analysis enables the relative importance of the various effects to be identified and offers the industry unique insight into various issues associated with the photomask. First, the unavoidable electromagnetic interaction as light propagates through the multiple phase steps of the mask topography appears to account for about 10 to 20% of the lost sensitivity, when experimental results are compared to an ideal simulated case. The polarization dependence of this effect is analyzed, concluding that the 4-phase topography is more effective at manipulating TM polarization. Second, various difficulties in the fabrication of these complicated mask patterns are described and likely account for an additional 60-80% loss in sensitivity. Smaller effects are also described, associated with the photoresist, mask design and subtle differences in the proximity effect of TE and TM polarization of off-axis light at high numerical aperture. Finally, the question: "How practical is PSM polarimetry?" is considered. It is concluded that, despite many severe limiting factors, an accurately calibrated test reticle promises to monitor polarization in state-of-the-art lithography scanners to within about 2%.
NASA Astrophysics Data System (ADS)
Liansheng, Sui; Yin, Cheng; Bing, Li; Ailing, Tian; Krishna Asundi, Anand
2018-07-01
A novel computational ghost imaging scheme based on specially designed phase-only masks, which can be efficiently applied to encrypt an original image into a series of measured intensities, is proposed in this paper. First, a Hadamard matrix with a certain order is generated, where the number of elements in each row is equal to the size of the original image to be encrypted. Each row of the matrix is rearranged into the corresponding 2D pattern. Then, each pattern is encoded into the phase-only masks by making use of an iterative phase retrieval algorithm. These specially designed masks can be wholly or partially used in the process of computational ghost imaging to reconstruct the original information with high quality. When a significantly small number of phase-only masks are used to record the measured intensities in a single-pixel bucket detector, the information can be authenticated without clear visualization by calculating the nonlinear correlation map between the original image and its reconstruction. The results illustrate the feasibility and effectiveness of the proposed computational ghost imaging mechanism, which will provide an effective alternative for enriching the related research on the computational ghost imaging technique.
Li, Guang; Lovelock, D Michael; Mechalakos, James; Rao, Shyam; Della-Biancia, Cesar; Amols, Howard; Lee, Nancy
2013-09-06
To provide an alternative device for immobilization of the head while easing claustrophobia and improving comfort, an "open-face" thermoplastic mask was evaluated using video-based optical surface imaging (OSI) and kilovoltage (kV) X-ray radiography. A three-point thermoplastic head mask with a precut opening and reinforced strips was developed. After molding, it provided sufficient visible facial area as the region of interest for OSI. Using real-time OSI, the head motion of ten volunteers in the new mask was evaluated during mask locking and 15minutes lying on the treatment couch. Using a nose mark with reference to room lasers, forced head movement in open-face and full-head masks (with a nose hole) was compared. Five patients with claustrophobia were immobilized with open-face masks, set up using OSI and kV, and treated in 121 fractions, in which 61 fractions were monitored during treatment using real-time OSI. With the open-face mask, head motion was found to be 1.0 ± 0.6 mm and 0.4° ± 0.2° in volunteers during the experiment, and 0.8 ± 0.3 mm and 0.4° ± 0.2° in patients during treatment. These agree with patient motion calculated from pre-/post-treatment OSI and kV data using different anatomical landmarks. In volunteers, the head shift induced by mask-locking was 2.3 ± 1.7 mm and 1.8° ± 0.6°, and the range of forced movements in the open-face and full-head masks were found to be similar. Most (80%) of the volunteers preferred the open-face mask to the full-head mask, while claustrophobic patients could only tolerate the open-face mask. The open-face mask is characterized for its immobilization capability and can immobilize patients sufficiently (< 2 mm) during radiotherapy. It provides a clinical solution to the immobilization of patients with head and neck (HN) cancer undergoing radiotherapy, and is particularly beneficial for claustrophobic patients. This new open-face mask is readily adopted in radiotherapy clinic as a superior alternative to the standard full-head mask.
Printability and inspectability of programmed pit defects on teh masks in EUV lithography
DOE Office of Scientific and Technical Information (OSTI.GOV)
Kang, I.-Y.; Seo, H.-S.; Ahn, B.-S.
2010-03-12
Printability and inspectability of phase defects in ELlVL mask originated from substrate pit were investigated. For this purpose, PDMs with programmed pits on substrate were fabricated using different ML sources from several suppliers. Simulations with 32-nm HP L/S show that substrate pits with below {approx}20 nm in depth would not be printed on the wafer if they could be smoothed by ML process down to {approx}1 nm in depth on ML surface. Through the investigation of inspectability for programmed pits, minimum pit sizes detected by KLA6xx, AIT, and M7360 depend on ML smoothing performance. Furthermore, printability results for pit defectsmore » also correlate with smoothed pit sizes. AIT results for pattemed mask with 32-nm HP L/S represents that minimum printable size of pits could be {approx}28.3 nm of SEVD. In addition, printability of pits became more printable as defocus moves to (-) directions. Consequently, printability of phase defects strongly depends on their locations with respect to those of absorber patterns. This indicates that defect compensation by pattern shift could be a key technique to realize zero printable phase defects in EUVL masks.« less
Generic hierarchical engine for mask data preparation
NASA Astrophysics Data System (ADS)
Kalus, Christian K.; Roessl, Wolfgang; Schnitker, Uwe; Simecek, Michal
2002-07-01
Electronic layouts are usually flattened on their path from the hierarchical source downstream to the wafer. Mask data preparation has certainly been identified as a severe bottleneck since long. Data volumes are not only doubling every year along the ITRS roadmap. With the advent of optical proximity correction and phase-shifting masks data volumes are escalating up to non-manageable heights. Hierarchical treatment is one of the most powerful means to keep memory and CPU consumption in reasonable ranges. Only recently, however, has this technique acquired more public attention. Mask data preparation is the most critical area calling for a sound infrastructure to reduce the handling problem. Gaining more and more attention though, are other applications such as large area simulation and manufacturing rule checking (MRC). They all would profit from a generic engine capable to efficiently treat hierarchical data. In this paper we will present a generic engine for hierarchical treatment which solves the major problem, steady transitions along cell borders. Several alternatives exist how to walk through the hierarchy tree. They have, to date, not been thoroughly investigated. One is a bottom-up attempt to treat cells starting with the most elementary cells. The other one is a top-down approach which lends itself to creating a new hierarchy tree. In addition, since the variety, degree of hierarchy and quality of layouts extends over a wide range a generic engine has to take intelligent decisions when exploding the hierarchy tree. Several applications will be shown, in particular how far the limits can be pushed with the current hierarchical engine.
Photomask applications of traceable atomic force microscope dimensional metrology at NIST
NASA Astrophysics Data System (ADS)
Dixson, Ronald; Orji, Ndubuisi G.; Potzick, James; Fu, Joseph; Allen, Richard A.; Cresswell, Michael; Smith, Stewart; Walton, Anthony J.; Tsiamis, Andreas
2007-10-01
The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. Three major instruments are being used for traceable measurements. The first is a custom in-house metrology AFM, called the calibrated AFM (C-AFM), the second is the first generation of commercially available critical dimension AFM (CD-AFM), and the third is a current generation CD-AFM at SEMATECH - for which NIST has established the calibration and uncertainties. All of these instruments have useful applications in photomask metrology. Linewidth reference metrology is an important application of CD-AFM. We have performed a preliminary comparison of linewidths measured by CD-AFM and by electrical resistance metrology on a binary mask. For the ten selected test structures with on-mask linewidths between 350 nm and 600 nm, most of the observed differences were less than 5 nm, and all of them were less than 10 nm. The offsets were often within the estimated uncertainties of the AFM measurements, without accounting for the effect of linewidth roughness or the uncertainties of electrical measurements. The most recent release of the NIST photomask standard - which is Standard Reference Material (SRM) 2059 - was also supported by CD-AFM reference measurements. We review the recent advances in AFM linewidth metrology that will reduce the uncertainty of AFM measurements on this and future generations of the NIST photomask standard. The NIST C-AFM has displacement metrology for all three axes traceable to the 633 nm wavelength of the iodine-stabilized He-Ne laser. One of the important applications of the C-AFM is step height metrology, which has some relevance to phase shift calibration. In the current generation of the system, the approximate level of relative standard uncertainty for step height measurements at the 100 nm scale is 0.1 %. We discuss the monitor history of a 290 nm step height, originally measured on the C-AFM with a 1.9 nm (k = 2) expanded uncertainty, and describe advances that bring the step height uncertainty of recent measurements to an estimated 0.6 nm (k = 2). Based on this work, we expect to be able to reduce the topographic component of phase uncertainty in alternating aperture phase shift masks (AAPSM) by a factor of three compared to current calibrations based on earlier generation step height references.
Vector scattering analysis of TPF coronagraph pupil masks
NASA Astrophysics Data System (ADS)
Ceperley, Daniel P.; Neureuther, Andrew R.; Lieber, Michael D.; Kasdin, N. Jeremy; Shih, Ta-Ming
2004-10-01
Rigorous finite-difference time-domain electromagnetic simulation is used to simulate the scattering from proto-typical pupil mask cross-section geometries and to quantify the differences from the normally assumed ideal on-off behavior. Shaped pupil plane masks are a promising technology for the TPF coronagraph mission. However the stringent requirements placed on the optics require that the detailed behavior of the edge-effects of these masks be examined carefully. End-to-end optical system simulation is essential and an important aspect is the polarization and cross-section dependent edge-effects which are the subject of this paper. Pupil plane masks are similar in many respects to photomasks used in the integrated circuit industry. Simulation capabilities such as the FDTD simulator, TEMPEST, developed for analyzing polarization and intensity imbalance effects in nonplanar phase-shifting photomasks, offer a leg-up in analyzing coronagraph masks. However, the accuracy in magnitude and phase required for modeling a chronograph system is extremely demanding and previously inconsequential errors may be of the same order of magnitude as the physical phenomena under study. In this paper, effects of thick masks, finite conductivity metals, and various cross-section geometries on the transmission of pupil-plane masks are illustrated. Undercutting the edge shape of Cr masks improves the effective opening width to within λ/5 of the actual opening but TE and TM polarizations require opposite compensations. The deviation from ideal is examined at the reference plane of the mask opening. Numerical errors in TEMPEST, such as numerical dispersion, perfectly matched layer reflections, and source haze are also discussed along with techniques for mitigating their impacts.
Mice lacking the PACAP type I receptor have impaired photic entrainment and negative masking.
Hannibal, Jens; Brabet, Philippe; Fahrenkrug, Jan
2008-12-01
The retinohypothalamic tract (RHT) is a retinofugal neuronal pathway which, in mammals, mediates nonimage-forming vision to various areas in the brain involved in circadian timing, masking behavior, and regulation of the pupillary light reflex. The RHT costores the two neurotransmitters glutamate and pituitary adenylate cyclase activating peptide (PACAP), which in a rather complex interplay are mediators of photic adjustment of the circadian system. To further characterize the role of PACAP/PACAP receptor type 1 (PAC1) receptor signaling in light entrainment of the clock and in negative masking behavior, we extended previous studies in mice lacking the PAC1 receptor (PAC1 KO) by examining their phase response to single light pulses using Aschoff type II regime, their ability to entrain to non-24-h light-dark (LD) cycles and large phase shifts of the LD cycle (jet lag), as well as their negative masking response during different light intensities. A prominent finding in PAC1 KO mice was a significantly decreased phase delay of the endogenous rhythm at early night. In accordance, PAC1 KO mice had a reduced ability to entrain to T cycles longer than 26 h and needed more time to reentrain to large phase delays, which was prominent at low light intensities. The data obtained at late night indicated that PACAP/PAC1 receptor signaling is less important during the phase-advancing part of the phase-response curve. Finally, the PAC1 KO mice showed impaired negative masking behavior at low light intensities. Our findings substantiate a role for PACAP/PAC1 receptor signaling in nonimage-forming vision and indicate that the system is particularly important at lower light intensities.
Analysis and modeling of photomask edge effects for 3D geometries and the effect on process window
NASA Astrophysics Data System (ADS)
Miller, Marshal A.; Neureuther, Andrew R.
2009-03-01
Simulation was used to explore boundary layer models for 1D and 2D patterns that would be appropriate for fast CAD modeling of physical effects during design. FDTD simulation was used to compare rigorous thick mask modeling to a thin mask approximation (TMA). When features are large, edges can be viewed as independent and modeled as separate from one another, but for small mask features, edges experience cross-talk. For attenuating phase-shift masks, interaction distances as large as 150nm were observed. Polarization effects are important for accurate EMF models. Due to polarization effects, the edge perturbations in line ends become different compared to a perpendicular edge. For a mask designed to be real, the 90o transmission created at edges produces an asymmetry through focus, which is also polarization dependent. Thick mask fields are calculated using TEMPEST and Panoramic Technologies software. Fields are then analyzed in the near field and on wafer CDs to examine deviations from TMA.
Hybrid shearing and phase-shifting point diffraction interferometer
Goldberg, Kenneth Alan; Naulleau, Patrick P.
2003-06-03
A new interferometry configuration combines the strengths of two existing interferometry methods, improving the quality and extending the dynamic range of both. On the same patterned mask, placed near the image-plane of an optical system under test, patterns for phase-shifting point diffraction interferometry and lateral shearing interferometry coexist. The former giving verifiable high accuracy for the measurement of nearly diffraction-limited optical systems. The latter enabling the measurement of optical systems with more than one wave of aberration in the system wavefront. The interferometry configuration is a hybrid shearing and point diffraction interferometer system for testing an optical element that is positioned along an optical path including: a source of electromagnetic energy in the optical path; a first beam splitter that is secured to a device that includes means for maneuvering the first beam splitter in a first position wherein the first beam splitter is in the optical path dividing light from the source into a reference beam and a test beam and in a second position wherein the first beam splitter is outside the optical path: a hybrid mask which includes a first section that defines a test window and at least one reference pinhole and a second section that defines a second beam splitter wherein the hybrid mask is secured to a device that includes means for maneuvering either the first section or the second section into the optical path positioned in an image plane that is created by the optical element, with the proviso that the first section of the hybrid mask is positioned in the optical path when first beam splitter is positioned in the optical path; and a detector positioned after the hybrid mask along the optical path.
NASA Astrophysics Data System (ADS)
Jiang, Yajun; Liu, Chi; Li, Dong; Yang, Dexing; Zhao, Jianlin
2018-04-01
A novel method for simultaneous measurement of temperature and strain using a single phase-shifted fiber Bragg grating (PS-FBG) is proposed. The PS-FBG is produced by exposing the fusion-spliced fiber with a femtosecond laser and uniform phase mask. Due to the non-uniform structure and strain distribution in the fusion-spliced region, the phase-shift changes with different responses during increases to the temperature and strain; by measuring the central wavelengths and the loss difference of two transmission dips, temperature and strain can be determined simultaneously. The resolutions of this particular sensor in measuring temperature and strain are estimated to be ±1.5 °C and ±12.2 µɛ in a range from -50 °C to 150 °C and from 0 µɛ to 2070 µɛ.
NASA Astrophysics Data System (ADS)
Meng, X. F.; Peng, X.; Cai, L. Z.; Li, A. M.; Gao, Z.; Wang, Y. R.
2009-08-01
A hybrid cryptosystem is proposed, in which one image is encrypted to two interferograms with the aid of double random-phase encoding (DRPE) and two-step phase-shifting interferometry (2-PSI), then three pairs of public-private keys are utilized to encode and decode the session keys (geometrical parameters, the second random-phase mask) and interferograms. In the stage of decryption, the ciphered image can be decrypted by wavefront reconstruction, inverse Fresnel diffraction, and real amplitude normalization. This approach can successfully solve the problem of key management and dispatch, resulting in increased security strength. The feasibility of the proposed cryptosystem and its robustness against some types of attack are verified and analyzed by computer simulations.
100-nm gate lithography for double-gate transistors
NASA Astrophysics Data System (ADS)
Krasnoperova, Azalia A.; Zhang, Ying; Babich, Inna V.; Treichler, John; Yoon, Jung H.; Guarini, Kathryn; Solomon, Paul M.
2001-09-01
The double gate field effect transistor (FET) is an exploratory device that promises certain performance advantages compared to traditional CMOS FETs. It can be scaled down further than the traditional devices because of the greater electrostatic control by the gates on the channel (about twice as short a channel length for the same gate oxide thickness), has steeper sub-threshold slope and about double the current for the same width. This paper presents lithographic results for double gate FET's developed at IBM's T. J. Watson Research Center. The device is built on bonded wafers with top and bottom gates self-aligned to each other. The channel is sandwiched between the top and bottom polysilicon gates and the gate length is defined using DUV lithography. An alternating phase shift mask was used to pattern gates with critical dimensions of 75 nm, 100 nm and 125 nm in photoresist. 50 nm gates in photoresist have also been patterned by 20% over-exposure of nominal 100 nm lines. No trim mask was needed because of a specific way the device was laid out. UV110 photoresist from Shipley on AR-3 antireflective layer were used. Process windows, developed and etched patterns are presented.
New mask technology challenges
NASA Astrophysics Data System (ADS)
Kimmel, Kurt R.
2001-09-01
Mask technology development has accelerated dramatically in recent years from the glacial pace of the last three decades to the rapid and sometimes simultaneous introductions of new wavelengths and mask-based resolution enhancement techniques. The nature of the semiconductor business has also become one driven by time-to-market as an overwhelming factor in capturing market share and profit. These are among the factors that have created enormous stress on the mask industry to produce masks with enhanced capabilities, such as phase-shifting attenuators, sub-resolution assist bars, and optical proximity correction (OPC) features, while maintaining or reducing cost and cycle time. The mask can no longer be considered a commodity item that is purchased form the lowest-cost supplier. Instead, it must now be promoted as an integral part of the technical and business case for a total lithographic solution. Improving partnership between designer, mask-maker, and wafer lithographer will be the harbinger of success in finding a profitable balance of capability, cost, and cycle time. Likewise for equipment infrastructure development, stronger partnership on the international level is necessary to control development cost and mitigate schedule and technical risks.
A Re-examination of the Effect of Masker Phase Curvature on Non-simultaneous Masking.
Carlyon, Robert P; Flanagan, Sheila; Deeks, John M
2017-12-01
Forward masking of a sinusoidal signal is determined not only by the masker's power spectrum but also by its phase spectrum. Specifically, when the phase spectrum is such that the output of an auditory filter centred on the signal has a highly modulated ("peaked") envelope, there is less masking than when that envelope is flat. This finding has been attributed to non-linearities, such as compression, reducing the average neural response to maskers that produce more peaked auditory filter outputs (Carlyon and Datta, J Acoust Soc Am 101:3636-3647, 1997). Here we evaluate an alternative explanation proposed by Wotcjzak and Oxenham (Wojtczak and Oxenham, J Assoc Res Otolaryngol 10:595-607, 2009). They reported a masker phase effect for 6-kHz signals when the masker components were at least an octave below the signal frequency. Wotcjzak and Oxenham argued that this effect was inconsistent with cochlear compression, and, because it did not occur at lower signal frequencies, was also inconsistent with more central compression. It was instead attributed to activation of the efferent system reducing the response to the subsequent probe. Here, experiment 1 replicated their main findings. Experiment 2 showed that the phase effect on off-frequency forward masking is similar at signal frequencies of 2 and 6 kHz, provided that one equates the number of components likely to interact within an auditory filter centred on the signal, thereby roughly equating the effect of masker phase on the peakiness of that filter output. Experiment 3 showed that for some subjects, masker phase also had a strong influence on off-frequency backward masking of the signal, and that the size of this effect correlated across subjects with that observed in forward masking. We conclude that the masker phase effect is mediated mainly by cochlear non-linearities, with a possible additional effect of more central compression. The data are not consistent with a role for the efferent system.
Improving vision by pupil masking
Bonaque-González, Sergio; Ríos-Rodríguez, Susana; López-Gil, Norberto
2016-01-01
We propose an alternative solution to improve visual quality by spatially modulating the amplitude of light passing into the eye (related to the eye's transmittance), in contrast to traditional correction of the wavefront phase (related to the local refractive power). Numerical simulations show that masking the aberrated areas at the pupil plane should enhance visual function, especially in highly aberrated eyes. This correction could be implemented in practice using customized contact or intraocular lenses. PMID:27446688
Multi-parameter fiber optic sensors based on fiber random grating
NASA Astrophysics Data System (ADS)
Xu, Yanping; Zhang, Mingjiang; Lu, Ping; Mihailov, Stephen; Bao, Xiaoyi
2017-04-01
Two novel configurations of multi-parameter fiber-optic sensing systems based on the fiber random grating are reported. The fiber random grating is fabricated through femtosecond laser induced refractive index modification over a 10cm standard telecom single mode fiber. In one configuration, the reflective spectrum of the fiber random grating is directly detected and a wavelength-division spectral cross-correlation algorithm is adopted to extract the spectral shifts for simultaneous measurement of temperature, axial strain, and surrounding refractive index. In the other configuration, a random fiber ring laser is constructed by incorporating the random feedback from the random grating. Numerous polarization-dependent spectral filters are formed along the random grating and superimposed to provide multiple lasing lines with high signal-to-noise ratio up to 40dB, which enables a high-fidelity multi-parameter sensing scheme by monitoring the spectral shifts of the lasing lines. Without the need of phase mask for fabrication and with the high physical strength, the random grating based sensors are much simpler and more compact, which could be potentially an excellent alternative for liquid medical sample sensing in biomedical and biochemical applications.
Harmonics rejection in pixelated interferograms using spatio-temporal demodulation.
Padilla, J M; Servin, M; Estrada, J C
2011-09-26
Pixelated phase-mask interferograms have become an industry standard in spatial phase-shifting interferometry. These pixelated interferograms allow full wavefront encoding using a single interferogram. This allows the study of fast dynamic events in hostile mechanical environments. Recently an error-free demodulation method for ideal pixelated interferograms was proposed. However, non-ideal conditions in interferometry may arise due to non-linear response of the CCD camera, multiple light paths in the interferometer, etc. These conditions generate non-sinusoidal fringes containing harmonics which degrade the phase estimation. Here we show that two-dimensional Fourier demodulation of pixelated interferograms rejects most harmonics except the complex ones at {-3(rd), +5(th), -7(th), +9(th), -11(th),…}. We propose temporal phase-shifting to remove these remaining harmonics. In particular, a 2-step phase-shifting algorithm is used to eliminate the -3(rd) and +5(th) complex harmonics, while a 3-step one is used to remove the -3(rd), +5<(th), -7(th) and +9(th) complex harmonics. © 2011 Optical Society of America
NASA Astrophysics Data System (ADS)
Liu, Qi; Wang, Ying; Wang, Jun; Wang, Qiong-Hua
2018-02-01
In this paper, a novel optical image encryption system combining compressed sensing with phase-shifting interference in fractional wavelet domain is proposed. To improve the encryption efficiency, the volume data of original image are decreased by compressed sensing. Then the compacted image is encoded through double random phase encoding in asymmetric fractional wavelet domain. In the encryption system, three pseudo-random sequences, generated by three-dimensional chaos map, are used as the measurement matrix of compressed sensing and two random-phase masks in the asymmetric fractional wavelet transform. It not only simplifies the keys to storage and transmission, but also enhances our cryptosystem nonlinearity to resist some common attacks. Further, holograms make our cryptosystem be immune to noises and occlusion attacks, which are obtained by two-step-only quadrature phase-shifting interference. And the compression and encryption can be achieved in the final result simultaneously. Numerical experiments have verified the security and validity of the proposed algorithm.
Developing a New Quantitative Account of Backward Masking
ERIC Educational Resources Information Center
Francis, Gregory
2003-01-01
A new general explanation for u-shaped backward masking is analyzed and found to predict shifts in the interstimulus interval (ISI) that produces strongest masking. This predicted shift is then compared to six sets of masking data. The resulting comparisons force the general explanation to make certain assumptions to account for the data. In this…
Coded aperture ptychography: uniqueness and reconstruction
NASA Astrophysics Data System (ADS)
Chen, Pengwen; Fannjiang, Albert
2018-02-01
Uniqueness of solution is proved for any ptychographic scheme with a random mask under a minimum overlap condition and local geometric convergence analysis is given for the alternating projection (AP) and Douglas-Rachford (DR) algorithms. DR is shown to possess a unique fixed point in the object domain and for AP a simple criterion for distinguishing the true solution among possibly many fixed points is given. A minimalist scheme, where the adjacent masks overlap 50% of the area and each pixel of the object is illuminated by exactly four illuminations, is conveniently parametrized by the number q of shifted masks in each direction. The lower bound 1 - C/q 2 is proved for the geometric convergence rate of the minimalist scheme, predicting a poor performance with large q which is confirmed by numerical experiments. The twin-image ambiguity is shown to arise for certain Fresnel masks and degrade the performance of reconstruction. Extensive numerical experiments are performed to explore the general features of a well-performing mask, the optimal value of q and the robustness with respect to measurement noise.
Scatterometry on pelliclized masks: an option for wafer fabs
NASA Astrophysics Data System (ADS)
Gallagher, Emily; Benson, Craig; Higuchi, Masaru; Okumoto, Yasuhiro; Kwon, Michael; Yedur, Sanjay; Li, Shifang; Lee, Sangbong; Tabet, Milad
2007-03-01
Optical scatterometry-based metrology is now widely used in wafer fabs for lithography, etch, and CMP applications. This acceptance of a new metrology method occurred despite the abundance of wellestablished CD-SEM and AFM methods. It was driven by the desire to make measurements faster and with a lower cost of ownership. Over the last year, scatterometry has also been introduced in advanced mask shops for mask measurements. Binary and phase shift masks have been successfully measured at all desired points during photomask production before the pellicle is mounted. There is a significant benefit to measuring masks with the pellicle in place. From the wafer fab's perspective, through-pellicle metrology would verify mask effects on the same features that are characterized on wafer. On-site mask verification would enable quality control and trouble-shooting without returning the mask to a mask house. Another potential application is monitoring changes to mask films once the mask has been delivered to the fab (haze, oxide growth, etc.). Similar opportunities apply to the mask metrologist receiving line returns from a wafer fab. The ability to make line-return measurements without risking defect introduction is clearly attractive. This paper will evaluate the feasibility of collecting scatterometry data on pelliclized masks. We explore the effects of several different pellicle types on scatterometry measurements made with broadband light in the range of 320-780 nm. The complexity introduced by the pellicles' optical behavior will be studied.
NASA Astrophysics Data System (ADS)
Baek, Jong Geun; Jang, Hyun Soo; Oh, Young Kee; Lee, Hyun Jeong; Kim, Eng Chan
2015-07-01
The purpose of this study was to evaluate the setup uncertainties for single-fraction stereotactic radiosurgery (SF-SRS) based on clinical data with two different mask-creation methods using pretreatment con-beam computed tomography imaging guidance. Dedicated frameless fixation Brain- LAB masks for 23 patients were created as a routine mask (R-mask) making method, as explained in the BrainLAB's user manual. Alternative masks (A-masks), which were created by modifying the cover range of the R-masks for the patient's head, were used for 23 patients. The systematic errors including these for each mask and stereotactic target localizer were analyzed, and the errors were calculated as the means ± standard deviations (SD) from the left-right (LR), superior-inferior (SI), anterior-posterior (AP), and yaw setup corrections. In addition, the frequencies of the threedimensional (3D) vector length were analyzed. The values of the mean setup corrections for the R-mask in all directions were < 0.7 mm and < 0.1°, whereas the magnitudes of the SDs were relatively large compared to the mean values. In contrast, the means and SDs of the A-mask were smaller than those for the R-mask with the exception of the SD in the AP direction. The means and SDs in the yaw rotational direction for the R-mask and the A-mask system were comparable. 3D vector shifts of larger magnitude occurred more frequently for the R-mask than the A-mask. The setup uncertainties for each mask with the stereotactic localizing system had an asymmetric offset towards the positive AP direction. The A-mask-creation method, which is capable of covering the top of the patient's head, is superior to that for the R-mask, so the use of the A-mask is encouraged for SF-SRS to reduce the setup uncertainties. Moreover, careful mask-making is required to prevent possible setup uncertainties.
Asadollahi, Ali; Endler, Frank; Nelken, Israel; Wagner, Hermann
2010-08-01
Humans and animals are able to detect signals in noisy environments. Detection improves when the noise and the signal have different interaural phase relationships. The resulting improvement in detection threshold is called the binaural masking level difference. We investigated neural mechanisms underlying the release from masking in the inferior colliculus of barn owls in low-frequency and high-frequency neurons. A tone (signal) was presented either with the same interaural time difference as the noise (masker) or at a 180 degrees phase shift as compared with the interaural time difference of the noise. The changes in firing rates induced by the addition of a signal of increasing level while masker level was kept constant was well predicted by the relative responses to the masker and signal alone. In many cases, the response at the highest signal levels was dominated by the response to the signal alone, in spite of a significant response to the masker at low signal levels, suggesting the presence of occlusion. Detection thresholds and binaural masking level differences were widely distributed. The amount of release from masking increased with increasing masker level. Narrowly tuned neurons in the central nucleus of the inferior colliculus had detection thresholds that were lower than or similar to those of broadly tuned neurons in the external nucleus of the inferior colliculus. Broadly tuned neurons exhibited higher masking level differences than narrowband neurons. These data suggest that detection has different spectral requirements from localization.
Enabling laboratory EUV research with a compact exposure tool
NASA Astrophysics Data System (ADS)
Brose, Sascha; Danylyuk, Serhiy; Tempeler, Jenny; Kim, Hyun-su; Loosen, Peter; Juschkin, Larissa
2016-03-01
In this work we present the capabilities of the designed and realized extreme ultraviolet laboratory exposure tool (EUVLET) which has been developed at the RWTH-Aachen, Chair for the Technology of Optical Systems (TOS), in cooperation with the Fraunhofer Institute for Laser Technology (ILT) and Bruker ASC GmbH. Main purpose of this laboratory setup is the direct application in research facilities and companies with small batch production, where the fabrication of high resolution periodic arrays over large areas is required. The setup can also be utilized for resist characterization and evaluation of its pre- and post-exposure processing. The tool utilizes a partially coherent discharge produced plasma (DPP) source and minimizes the number of other critical components to a transmission grating, the photoresist coated wafer and the positioning system for wafer and grating and utilizes the Talbot lithography approach. To identify the limits of this approach first each component is analyzed and optimized separately and relations between these components are identified. The EUV source has been optimized to achieve the best values for spatial and temporal coherence. Phase-shifting and amplitude transmission gratings have been fabricated and exposed. Several commercially available electron beam resists and one EUV resist have been characterized by open frame exposures to determine their contrast under EUV radiation. Cold development procedure has been performed to further increase the resist contrast. By analyzing the exposure results it can be demonstrated that only a 1:1 copy of the mask structure can be fully resolved by the utilization of amplitude masks. The utilized phase-shift masks offer higher 1st order diffraction efficiency and allow a demagnification of the mask structure in the achromatic Talbot plane.
Lovelock, D. Michael; Mechalakos, James; Rao, Shyam; Della‐Biancia, Cesar; Amols, Howard; Lee, Nancy
2013-01-01
To provide an alternative device for immobilization of the head while easing claustrophobia and improving comfort, an “open‐face” thermoplastic mask was evaluated using video‐based optical surface imaging (OSI) and kilovoltage (kV) X‐ray radiography. A three‐point thermoplastic head mask with a precut opening and reinforced strips was developed. After molding, it provided sufficient visible facial area as the region of interest for OSI. Using real‐time OSI, the head motion of ten volunteers in the new mask was evaluated during mask locking and 15 minutes lying on the treatment couch. Using a nose mark with reference to room lasers, forced head movement in open‐face and full‐head masks (with a nose hole) was compared. Five patients with claustrophobia were immobilized with open‐face masks, set up using OSI and kV, and treated in 121 fractions, in which 61 fractions were monitored during treatment using real‐time OSI. With the open‐face mask, head motion was found to be 1.0 ± 0.6 mm and 0.4° ± 0.2° in volunteers during the experiment, and 0.8 ± 0.3 mm and 0.4° ± 0.2° in patients during treatment. These agree with patient motion calculated from pre‐/post‐treatment OSI and kV data using different anatomical landmarks. In volunteers, the head shift induced by mask‐locking was 2.3 ± 1.7 mm and 1.8° ± 0.6°, and the range of forced movements in the open‐face and full‐head masks were found to be similar. Most (80%) of the volunteers preferred the open‐face mask to the full‐head mask, while claustrophobic patients could only tolerate the open‐face mask. The open‐face mask is characterized for its immobilization capability and can immobilize patients sufficiently (< 2 mm) during radiotherapy. It provides a clinical solution to the immobilization of patients with head and neck (HN) cancer undergoing radiotherapy, and is particularly beneficial for claustrophobic patients. This new open‐face mask is readily adopted in radiotherapy clinic as a superior alternative to the standard full‐head mask. PACS numbers: 87.19.xj, 87.63.L‐, 87.59.‐e, 87.55.tg, 87.55.‐x PMID:24036878
Monte Carlo sensitivity analysis of EUV mask reflectivity and its impact on OPC accuracy
NASA Astrophysics Data System (ADS)
Chen, Yulu; Wood, Obert; Rankin, Jed; Gullikson, Eric; Meyer-Ilse, Julia; Sun, Lei; Qi, Zhengqing John; Goodwin, Francis; Kye, Jongwook
2017-03-01
Unlike optical masks which are transmissive optical elements, use of extreme ultraviolet (EUV) radiation requires a reflective mask structure - a multi-layer coating consisting of alternating layers of high-Z (wave impedance) and low-Z materials that provide enhanced reflectivity over a narrow wavelength band peaked at the Bragg wavelength.1 Absorber side wall angle, corner rounding,2 surface roughness,3 and defects4 affect mask performance, but even seemingly simple parameters like bulk reflectivity on mirror and absorber surfaces can have a profound influence on imaging. For instance, using inaccurate reflectivity values at small and large incident angles would diminish the benefits of source mask co-optimization (SMO) and result in larger than expected pattern shifts. The goal of our work is to calculate the variation in mask reflectivity due to various sources of inaccuracies using Monte Carlo simulations. Such calculation is necessary as small changes in the thickness and optical properties of the high-Z and low-Z materials can cause substantial variations in reflectivity. This is further complicated by undesirable intermixing between the two materials used to create the reflector.5 One of the key contributors to mask reflectivity fluctuation is identified to be the intermixing layer thickness. We also investigate the impacts on OPC when the wrong mask information is provided, and evaluate the deterioration of overlapping process window. For a hypothetical N7 via layer, the lack of accurate mask information costs 25% of the depth of focus at 5% exposure latitude. Our work would allow the determination of major contributors to mask reflectivity variation, drive experimental efforts of measuring such contributors, provide strategies to optimize mask reflectivity, and quantize the OPC errors due to imperfect mask modeling.
Pattern masking: the importance of remote spatial frequencies and their phase alignment.
Huang, Pi-Chun; Maehara, Goro; May, Keith A; Hess, Robert F
2012-02-16
To assess the effects of spatial frequency and phase alignment of mask components in pattern masking, target threshold vs. mask contrast (TvC) functions for a sine-wave grating (S) target were measured for five types of mask: a sine-wave grating (S), a square-wave grating (Q), a missing fundamental square-wave grating (M), harmonic complexes consisting of phase-scrambled harmonics of a square wave (Qp), and harmonic complexes consisting of phase-scrambled harmonics of a missing fundamental square wave (Mp). Target and masks had the same fundamental frequency (0.46 cpd) and the target was added in phase with the fundamental frequency component of the mask. Under monocular viewing conditions, the strength of masking depends on phase relationships among mask spatial frequencies far removed from that of the target, at least 3 times the target frequency, only when there are common target and mask spatial frequencies. Under dichoptic viewing conditions, S and Q masks produced similar masking to each other and the phase-scrambled masks (Qp and Mp) produced less masking. The results suggest that pattern masking is spatial frequency broadband in nature and sensitive to the phase alignments of spatial components.
Alternative stable states and phase shifts in coral reefs under anthropogenic stress.
Fung, Tak; Seymour, Robert M; Johnson, Craig R
2011-04-01
Ecosystems with alternative stable states (ASS) may shift discontinuously from one stable state to another as environmental parameters cross a threshold. Reversal can then be difficult due to hysteresis effects. This contrasts with continuous state changes in response to changing environmental parameters, which are less difficult to reverse. Worldwide degradation of coral reefs, involving "phase shifts" from coral to algal dominance, highlights the pressing need to determine the likelihood of discontinuous phase shifts in coral reefs, in contrast to continuous shifts with no ASS. However, there is little evidence either for or against the existence of ASS for coral reefs. We use dynamic models to investigate the likelihood of continuous and discontinuous phase shifts in coral reefs subject to sustained environmental perturbation by fishing, nutrification, and sedimentation. Our modeling results suggest that coral reefs with or without anthropogenic stress can exhibit ASS, such that discontinuous phase shifts can occur. We also find evidence to support the view that high macroalgal growth rates and low grazing rates on macroalgae favor ASS in coral reefs. Further, our results suggest that the three stressors studied, either alone or in combination, can increase the likelihood of both continuous and discontinuous phase shifts by altering the competitive balance between corals and algae. However, in contrast to continuous phase shifts, we find that discontinuous shifts occur only in model coral reefs with parameter values near the extremes of their empirically determined ranges. This suggests that continuous shifts are more likely than discontinuous shifts in coral reefs. Our results also suggest that, for ecosystems in general, tackling multiple human stressors simultaneously maximizes resilience to phase shifts, ASS, and hysteresis, leading to improvements in ecosystem health and functioning.
An integrated optical CO2 sensor. Phase 0: Design and fabrication of critical elements
NASA Technical Reports Server (NTRS)
Murphy, Michael C.; Kelly, Kevin W.; Li, B. Q.; Ma, EN; Wang, Wanjun; Vladimirsky, Yuli; Vladimirsky, Olga
1994-01-01
Significant progress has been made toward all of the goals for the first phase of the project short of actual fabrication of a light path. Two alternative approaches to fabricating gold mirrors using the basic LIGA process were developed, one using electroplated solid gold mirrors and the second using gold plated over a nickel base. A new method of fabrication, the transfer mask process, was developed and demonstrated. Analysis of the projected surface roughness and beam divergence effects was completed. With gold surface with low surface roughness scattering losses are expected to be insignificant. Beam divergence due to diffraction will require a modification of the original design, but should be eliminated by fabricating mirrors 1000 mu m in height by 1000 mu m in width and using a source with an initial beam radius greater than 300 mu m. This may eliminate any need for focusing optics. Since the modified design does not affect the mask layout, ordering of the mask and fabrication of the test structures can begin immediately at the start of Phase 1.
NASA Astrophysics Data System (ADS)
Hanf, Marian; Schaporin, Alexey V.; Hahn, Ramon; Doetzel, Wolfram; Gessner, Thomas
2005-01-01
The paper deals with a novel setup of a Hadamard transform spectrometer (HTS) which encoding mask is realized by a micro mirror array. In contrast to other applications of an HTS the mirrors of the array are not statically switched but dynamically driven to oscillate at the same frequency. The Hadamard transform is obtained by shifting the phase shift of oscillation. The paper gives a brief introduction in the entity of the Hadamard transform technique. The driving and detection circuits are presented and first measurement results are discussed.
Reticle haze: an industrial approach
NASA Astrophysics Data System (ADS)
Gough, Stuart; Gérard, Xavier; Bichebois, Pascal; Roche, Agnès; Sundermann, Frank; Guyader, Véronique; Bièron, Yann; Galvier, Jean; Nicoleau, Serge
2007-02-01
Crystal growth on advanced reticles is currently a world wide industrial problem in high end semiconductor production environment, crystals are mainly found on reticles that use high energy photons at 193nm wavelength. The most common crystals to be found on masks are ammonium sulphate, a combination of sulphate, from maskshop residues after clean, pellicle materials and storage conditions and amines from clean room, tool and storage environments. High energy photons act as a catalyst to form crystals on both the pattern side as well as the backglass surface. After a number of exposures crystals can grow in size and eventually become printable. In order to detect HAZE before critical dimensions have been reached suitable detection methods need to be implemented to ensure image integrity. These detection methods are different and complementary depending on the surface to be inspected. Once crystals have started growing, the only method to regain mask quality is to clean the mask at the manufacturers site. This brings with it several undesirable situations, not only is the mask unavailable for production but the cleaning of a mask leads to a potential risk of damaging the mask especially for sub resolution patterns such as scatter bars and phase and transmission changes for eaPSM (Embedded Attenuated Phase Shift Mask) masks. This paper will discuss the initial haze issues seen in a 300mm wafer fab and actions put in place to address the problem. An explanation of results gained from haze reduction actions implemented in a wafer fab will be given. Haze seen by reticle inspection and surface analysis tools can be characterised by typical contamination patterns. These signatures appear after a certain number of wafers exposed depending on several reticle variables such as transmission, Binary, eaPSM, Pellicle. Details will be given of how reticles are managed to ensure minimum impact to a production environment with an appropriate reticle control plan. AMC (Airborne Molecular Contamination) in wafer fab and equipment environment is a key factor for crystal growth. The type of filtration installed to reduce AMC and method of atmospheric monitoring for critical areas will be explained. Choice of reticle storage conditions and materials used for transport during the life of the reticle will be included. Improvements in maskshop cleaning processes, reticle materials and environmental control have lead to extended mask lifetime in the wafer fab of more than 20 times. The fundamental differences and relative monitoring will be described and gain from implemented actions will be presented Once crystals have started growing, the only method to regain mask quality is to clean the mask at the manufacturers site. This brings with it several undesirable situations, not only is the mask unavailable for production but the cleaning of a mask leads to a potential risk of damaging the mask especially for sub resolution patterns such as scatter bars and phase and transmission changes for eaPSM (Embedded Attenuated Phase Shift Mask) masks. This paper will discuss the initial haze issues seen in a 300mm wafer fab and actions put in place to address the problem. An explanation of results gained from haze reduction actions implemented in a wafer fab will be given. Haze seen by reticle inspection and surface analysis tools can be characterised by typical contamination patterns. These signatures appear after a certain number of wafers exposed depending on several reticle variables such as transmission, Binary, eaPSM, Pellicle. Details will be given of how reticles are managed to ensure minimum impact to a production environment with an appropriate reticle control plan. AMC (Airborne Molecular Contamination) in wafer fab and equipment environment is a key factor for crystal growth. The type of filtration installed to reduce AMC and method of atmospheric monitoring for critical areas will be explained. Choice of reticle storage conditions and materials used for transport during the life of the reticle will be included. Improvements in maskshop cleaning processes, reticle materials and environmental control have lead to extended mask lifetime in the wafer fab of more than 20 times. The fundamental differences and relative monitoring will be described and gain from implemented actions will be presented
Genetic control of phyllotaxy phase shift in juvenile vines in a rootstock hybrid population
USDA-ARS?s Scientific Manuscript database
Grapevine seedlings initially display spiral phyllotaxy of true leaves, then undergo a shift to alternate phyllotaxy with the production of the first lateral meristems (typically tendrils). The node at which the shift from spiral to alternate phyllotaxy occurs varies from about the 4th to about the...
Cloud Motion in the GOCI COMS Ocean Colour Data
NASA Technical Reports Server (NTRS)
Robinson, Wayne D.; Franz, Bryan A.; Mannino, Antonio; Ahn, Jae-Hyun
2016-01-01
The Geostationary Ocean Colour Imager (GOCI) instrument, on Koreas Communications, Oceans, and Meteorological Satellite (COMS), can produce a spectral artefact arising from the motion of clouds the cloud is spatially shifted and the amount of shift varies by spectral band. The length of time it takes to acquire all eight GOCI bands for a given slot (portion of a scene) is sucient to require that cloud motion be taken into account to fully mask or correct the eects of clouds in all bands. Inter-band correlations can be used to measure the amount of cloud shift, which can then be used to adjust the cloud mask so that the union of all shifted masks can act as a mask for all bands. This approach reduces the amount of masking required versus a simple expansion of the mask in all directions away from clouds. Cloud motion can also aect regions with unidentied clouds thin or fractional clouds that evade the cloud identication process yielding degraded quality in retrieved ocean colour parameters. Areas with moving and unidentied clouds require more elaborate masking algo-rithms to remove these degraded retrievals. Correction for the eects of moving fractional clouds may also be possible. The cloud shift information can be used to determine cloud motion and thus wind at the cloud levels on sub-minute timescales. The benecial and negative eects of moving clouds should be con-sidered for any ocean colour instrument design and associated data processing plans.
Young, Laura K; Smithson, Hannah E
2014-01-01
There is evidence that letter identification is mediated by only a narrow band of spatial frequencies and that the center frequency of the neural channel thought to underlie this selectivity is related to the size of the letters. When letters are spatially filtered (at a fixed size) the channel tuning characteristics change according to the properties of the spatial filter (Majaj et al., 2002). Optical aberrations in the eye act to spatially filter the image formed on the retina-their effect is generally to attenuate high frequencies more than low frequencies but often in a non-monotonic way. We might expect the change in the spatial frequency spectrum caused by the aberration to predict the shift in channel tuning observed for aberrated letters. We show that this is not the case. We used critical-band masking to estimate channel-tuning in the presence of three types of aberration-defocus, coma and secondary astigmatism. We found that the maximum masking was shifted to lower frequencies in the presence of an aberration and that this result was not simply predicted by the spatial-frequency-dependent degradation in image quality, assessed via metrics that have previously been shown to correlate well with performance loss in the presence of an aberration. We show that if image quality effects are taken into account (using visual Strehl metrics), the neural channel required to model the data is shifted to lower frequencies compared to the control (no-aberration) condition. Additionally, we show that when spurious resolution (caused by π phase shifts in the optical transfer function) in the image is masked, the channel tuning properties for aberrated letters are affected, suggesting that there may be interference between visual channels. Even in the presence of simulated aberrations, whose properties change from trial-to-trial, observers exhibit flexibility in selecting the spatial frequencies that support letter identification.
Masking of low-frequency signals by high-frequency, high-level narrow bands of noisea
Patra, Harisadhan; Roup, Christina M.; Feth, Lawrence L.
2011-01-01
Low-frequency masking by intense high-frequency noise bands, referred to as remote masking (RM), was the first evidence to challenge energy-detection models of signal detection. Its underlying mechanisms remain unknown. RM was measured in five normal-hearing young-adults at 250, 350, 500, and 700 Hz using equal-power, spectrally matched random-phase noise (RPN) and low-noise noise (LNN) narrowband maskers. RM was also measured using equal-power, two-tone complex (TC2) and eight-tone complex (TC8). Maskers were centered at 3000 Hz with one or two equivalent rectangular bandwidths (ERBs). Masker levels varied from 80 to 95 dB sound pressure level in 5 dB steps. LNN produced negligible masking for all conditions. An increase in bandwidth in RPN yielded greater masking over a wider frequency region. Masking for TC2 was limited to 350 and 700 Hz for one ERB but shifted to only 700 Hz for two ERBs. A spread of masking to 500 and 700 Hz was observed for TC8 when the bandwidth was increased from one to two ERBs. Results suggest that high-frequency noise bands at high levels could generate significant low-frequency masking. It is possible that listeners experience significant RM due to the amplification of various competing noises that might have significant implications for speech perception in noise. PMID:21361445
Optical Fibers Would Sense Local Strains
NASA Technical Reports Server (NTRS)
Egalon, Claudio O.; Rogowski, Robert S.
1994-01-01
Proposed fiber-optic transducers measure local strains. Includes lead-in and lead-out lengths producing no changes in phase shifts, plus short sensing length in which phase shift is sensitive to strain. Phase shifts in single-mode fibers vary with strains. In alternative version, multiple portions of optical fiber sensitive to strains characteristic of specific vibrational mode of object. Same principle also used with two-mode fiber.
Manufacturability study of masks created by inverse lithography technology (ILT)
NASA Astrophysics Data System (ADS)
Martin, Patrick M.; Progler, C. J.; Xiao, G.; Gray, R.; Pang, L.; Liu, Y.
2005-11-01
As photolithography is pushed to fabricate deep-sub wavelength devices for 90nm, 65nm and smaller technology nodes using available exposure tools (i.e., 248nm, 193nm steppers), photomask capability is becoming extremely critical. For example, PSM masks require more complicated processing; aggressive OPC makes the writing time longer and sometimes unpredictable; and, high MEEF imposes much more stringent demands on mask quality. Therefore, in order for any new lithography technology to be adopted into production, mask manufacturability must be studied thoroughly and carefully. In this paper we will present the mask manufacturability study on mask patterns created using Inverse Lithography Technology (ILT). Unlike conventional OPC methodologies, ILT uses a unique outcome-based technology to mathematically determine the mask features that produce the desired on-wafer results. ILT solves the most critical litho challenges of the deep sub-wavelength era. Potential benefits include: higher yield; expanded litho process windows; superb pattern fidelity at 90, 65 & 45-nm nodes; and reduced time-to-silicon - all without changing the existing lithography infrastructure and design-to-silicon flow. In this study a number of cell structures were selected and used as test patterns. "Luminized patterns" were generated for binary mask and attenuated phase-shift mask. Both conventional OPC patterns and "luminized patterns" were put on a test reticle side by side, and they all have a number of variations in term of correction aggressivity level and mask complexity. Mask manufacturability, including data fracturing, writing time, mask inspection, and metrology were studied. The results demonstrate that, by optimizing the inspection recipe, masks created using ILT technology can be made and qualified using current processes with a reasonable turn-around time.
A layered modulation method for pixel matching in online phase measuring profilometry
NASA Astrophysics Data System (ADS)
Li, Hongru; Feng, Guoying; Bourgade, Thomas; Yang, Peng; Zhou, Shouhuan; Asundi, Anand
2016-10-01
An online phase measuring profilometry with new layered modulation method for pixel matching is presented. In this method and in contrast with previous modulation matching methods, the captured images are enhanced by Retinex theory for better modulation distribution, and all different layer modulation masks are fully used to determine the displacement of a rectilinear moving object. High, medium and low modulation masks are obtained by performing binary segmentation with iterative Otsu method. The final shifting pixels are calculated based on centroid concept, and after that the aligned fringe patterns can be extracted from each frame. After performing Stoilov algorithm and a series of subsequent operations, the object profile on a translation stage is reconstructed. All procedures are carried out automatically, without setting specific parameters in advance. Numerical simulations are detailed and experimental results verify the validity and feasibility of the proposed approach.
FPGA chip performance improvement with gate shrink through alternating PSM 90nm process
NASA Astrophysics Data System (ADS)
Yu, Chun-Chi; Shieh, Ming-Feng; Liu, Erick; Lin, Benjamin; Ho, Jonathan; Wu, Xin; Panaite, Petrisor; Chacko, Manoj; Zhang, Yunqiang; Lei, Wen-Kang
2005-11-01
In the post-physical verification space called 'Mask Synthesis' a key component of design-for-manufacturing (DFM), double-exposure based, dark-field, alternating PSM (Alt-PSM) is being increasingly applied at the 90nm node in addition with other mature resolution enhancement techniques (RETs) such as optical proximity correction (OPC) and sub-resolution assist features (SRAF). Several high-performance IC manufacturers already use alt-PSM technology in 65nm production. At 90nm having strong control over the lithography process is a critical component in meeting targeted yield goals. However, implementing alt-PSM in production has been challenging due to several factors such as phase conflict errors, mask manufacturing, and the increased production cost due to the need for two masks in the process. Implementation of Alt-PSM generally requires phase compliance rules and proper phase topology in the layout and this has been successful for the technology node with these rules implemented. However, this may not be true for a mature, production process technology, in this case 90 nm. Especially, in the foundry-fabless business model where the foundry provides a standard set of design rules to its customers for a given process technology, and where not all the foundry customers require Alt-PSM in their tapeout flow. With minimum design changes, design houses usually are motivated by higher product performance for the existing designs. What follows is an in-depth review of the motivation to apply alt-PSM on a production FPGA, the DFM challenges to each partner faced, its effect on the tapeout flow, and how design, manufacturing, and EDA teams worked together to resolve phase conflicts, tapeout the chip, and finally verify the silicon results in production.
Phase shifting two coupled circadian pacemakers - Implications for jet lag
NASA Technical Reports Server (NTRS)
Gander, P. H.; Kronauer, R. E.; Graeber, R. C.
1985-01-01
Two Van der Pol oscillators with reciprocal linear velocity coupling are utilized to model the response of the human circadian timing system to abrupt displacements of the environmental time cues (zeitgebers). The core temperature rhythm and sleep-wake cycle simulated by the model are examined. The relationship between the masking of circadian rhythms by environmental variables and behavioral and physiological events and the rates of resynchronization is studied. The effects of zeitgeber phase shifts and zeitgeber strength on the resynchronization rates are analyzed. The influence of intrinsic pacemakers periods and coupling strength on resynchronization are investigated. The simulated data reveal that: resynchronization after a time zone shift depends on the magnitude of the shift; the time of day of the shift has little influence on resynchronization; the strength of zeitgebers affects the rate and direction of the resynchronization; the intrinsic pacemaker periods have a significant effect on resynchronization; and increasing the coupling between the oscillators results in an increase in the rate of resynchronization. The model data are compared to transmeridian flight studies data and similar resynchronization patterns are observed.
Removal of central obscuration and spider arm effects with beam-shaping coronagraphy
NASA Astrophysics Data System (ADS)
Abe, L.; Murakami, N.; Nishikawa, J.; Tamura, M.
2006-05-01
This paper describes a method for removing the effect of a centrally obscured aperture with additional spider arms in arbitrary geometrical configurations. The proposed method is based on a two-stage process where the light beam is first shaped to remove the central obscuration and spider arms, in order to feed a second, highly efficient coronagraph. The beam-shaping stage is a combination of a diffraction mask in the first focal plane and a complex amplitude filter located in the conjugate pupil. This paper specifically describes the case of using Lyot occulting masks and circular phase-shifting masks as diffracting components. The basic principle of the method is given along with an analytical description and numerical simulations. Substantial improvement in the performance of high-contrast coronagraphs can be obtained with this method, even if the beam-shaping filter is not perfectly manufactured.
High energy X-ray phase and dark-field imaging using a random absorption mask.
Wang, Hongchang; Kashyap, Yogesh; Cai, Biao; Sawhney, Kawal
2016-07-28
High energy X-ray imaging has unique advantage over conventional X-ray imaging, since it enables higher penetration into materials with significantly reduced radiation damage. However, the absorption contrast in high energy region is considerably low due to the reduced X-ray absorption cross section for most materials. Even though the X-ray phase and dark-field imaging techniques can provide substantially increased contrast and complementary information, fabricating dedicated optics for high energies still remain a challenge. To address this issue, we present an alternative X-ray imaging approach to produce transmission, phase and scattering signals at high X-ray energies by using a random absorption mask. Importantly, in addition to the synchrotron radiation source, this approach has been demonstrated for practical imaging application with a laboratory-based microfocus X-ray source. This new imaging method could be potentially useful for studying thick samples or heavy materials for advanced research in materials science.
Use of KRS-XE positive chemically amplified resist for optical mask manufacturing
NASA Astrophysics Data System (ADS)
Ashe, Brian; Deverich, Christina; Rabidoux, Paul A.; Peck, Barbara; Petrillo, Karen E.; Angelopoulos, Marie; Huang, Wu-Song; Moreau, Wayne M.; Medeiros, David R.
2002-03-01
The traditional mask making process uses chain scission-type resists such as PBS, poly(butene-1-sulfone), and ZEP, poly(methyl a-chloroacrylate-co-a-methylstyrene) for making masks with dimensions greater than 180nm. PBS resist requires a wet etch process to produce patterns in chrome. ZEP was employed for dry etch processing to meet the requirements of shrinking dimensions, optical proximity corrections and phase shift masks. However, ZEP offers low contrast, marginal etch resistance, organic solvent development, and concerns regarding resist heating with its high dose requirements1. Chemically Amplified Resist (CAR) systems are a very good choice for dimensions less than 180nm because of their high sensitivity and contrast, high resolution, dry etch resistance, aqueous development, and process latitude2. KRS-XE was developed as a high contrast CA resist based on ketal protecting groups that eliminate the need for post exposure bake (PEB). This resist can be used for a variety of electron beam exposures, and improves the capability to fabricate masks for devices smaller than 180nm. Many factors influence the performance of resists in mask making such as post apply bake, exposure dose, resist develop, and post exposure bake. These items will be discussed as well as the use of reactive ion etching (RIE) selectivity and pattern transfer.
Asymmetry in Object Substitution Masking Occurs Relative to the Direction of Spatial Attention Shift
ERIC Educational Resources Information Center
Hirose, Nobuyuki; Osaka, Naoyuki
2010-01-01
A sparse mask that persists beyond the duration of a target can reduce its visibility, a phenomenon called "object substitution masking". Y. Jiang and M. M. Chun (2001a) found an asymmetric pattern of substitution masking such that a mask on the peripheral side of the target caused stronger substitution masking than on the central side.…
New PSM optimized for stable resolution of fine holes in FPD
NASA Astrophysics Data System (ADS)
Imashiki, Nobuhisa; Yoshikawa, Yutaka; Hayase, Michihiko
2017-07-01
Recently, due to increases in the definition of high function panels for mobile devices such as smartphones and tablets, LCD panel TFT and OLED (organic electro luminescence display) circuits are becoming increasingly denser and more miniaturized by the year. TFT and OLED circuits are composed of several layers, such as gate, semiconductor and contact hole (C / H). It is particularly difficult to obtain a stable resolution for C/H due to the decrease in the C/H process margin (EL, DOF, MEEF) as a result of increases in the density of the circuit. Moreover, C/H productivity has also markedly decreased due to an increase in the exposure dose. In response to this, attenuated phase shift mask (Att. PSM) for large size photomasks have been proposed as a means to improve the process margin in FPD. We have developed new PSM that can further improve the process margin and the productivity of C/H via the effective positioning of a high transmittance phase shift film. Using a 1.5um sized hole as the target, we confirmed the improvement effect of the optimized PSM via a software simulation and an exposure test. Hereafter it is necessary for us to optimize the new PSM for each panel process so as to allow us to use this mask in actual processes.
NASA Technical Reports Server (NTRS)
Simon, M. K.
1974-01-01
Multilevel amplitude-shift-keying (MASK) and quadrature amplitude-shift-keying (QASK) as signaling techniques for multilevel digital communications systems, and the problem of providing symbol synchronization in the receivers of such systems are discussed. A technique is presented for extracting symbol sync from an MASK or QASK signal. The scheme is a generalization of the data transition tracking loop used in PSK systems. The performance of the loop was analyzed in terms of its mean-squared jitter and its effects on the data detection process in MASK and QASK systems.
Forward Masking of the Speech-Evoked Auditory Brainstem Response.
Hodge, Sarah E; Menezes, Denise C; Brown, Kevin D; Grose, John H
2018-02-01
The hypothesis tested was that forward masking of the speech-evoked auditory brainstem response (sABR) increases peak latency as an inverse function of masker-signal interval (Δt), and that the overall persistence of forward masking is age dependent. Older listeners exhibit deficits in forward masking. If forward-masked sABRs provide an objective measure of the susceptibility of speech sounds to prior stimulation, then this provides a novel approach to examining the age dependence of temporal processing. A /da/ stimulus forward masked by speech-shaped noise (Δt = 4-64 ms) was used to measure sABRs in 10 younger and nine older participants. Forward masking of subsegments of the /da/ stimulus (Δt = 16 ms) and click trains (Δt = 0-64 ms) was also measured. Forward-masked sABRs from young participants showed an increase in latency with decreasing Δt for the initial peak. Latency shifts for later peaks were smaller and more uniform. None of the peak latencies returned to baseline by Δt = 64 ms. Forward-masked /da/ subsegments showed peak latency shifts that did not depend simply on peak position, while forward-masked click trains showed latency shifts that were dependent on click position. The sABRs from older adults were less robust but confirmed the viability of the approach. Forward masking of the sABR provides an objective measure of the susceptibility of the auditory system to prior stimulation. Failure of recovery functions to return to baseline suggests an interaction between forward masking by the prior masker and temporal effects within the stimulus itself.
Resurgence and alternative-reinforcer magnitude.
Craig, Andrew R; Browning, Kaitlyn O; Nall, Rusty W; Marshall, Ciara M; Shahan, Timothy A
2017-03-01
Resurgence is defined as an increase in the frequency of a previously reinforced target response when an alternative source of reinforcement is suspended. Despite an extensive body of research examining factors that affect resurgence, the effects of alternative-reinforcer magnitude have not been examined. Thus, the present experiments aimed to fill this gap in the literature. In Experiment 1, rats pressed levers for single-pellet reinforcers during Phase 1. In Phase 2, target-lever pressing was extinguished, and alternative-lever pressing produced either five-pellet, one-pellet, or no alternative reinforcement. In Phase 3, alternative reinforcement was suspended to test for resurgence. Five-pellet alternative reinforcement produced faster elimination and greater resurgence of target-lever pressing than one-pellet alternative reinforcement. In Experiment 2, effects of decreasing alternative-reinforcer magnitude on resurgence were examined. Rats pressed levers and pulled chains for six-pellet reinforcers during Phases 1 and 2, respectively. In Phase 3, alternative reinforcement was decreased to three pellets for one group, one pellet for a second group, and suspended altogether for a third group. Shifting from six-pellet to one-pellet alternative reinforcement produced as much resurgence as suspending alternative reinforcement altogether, while shifting from six pellets to three pellets did not produce resurgence. These results suggest that alternative-reinforcer magnitude has effects on elimination and resurgence of target behavior that are similar to those of alternative-reinforcer rate. Thus, both suppression of target behavior during alternative reinforcement and resurgence when conditions of alternative reinforcement are altered may be related to variables that affect the value of the alternative-reinforcement source. © 2017 Society for the Experimental Analysis of Behavior.
Resurgence and Alternative-Reinforcer Magnitude
Craig, Andrew R.; Browning, Kaitlyn O.; Nall, Rusty W.; Marshall, Ciara M.; Shahan, Timothy A.
2017-01-01
Resurgence is defined as an increase in the frequency of a previously reinforced target response when an alternative source of reinforcement is suspended. Despite an extensive body of research examining factors that affect resurgence, the effects of alternative-reinforcer magnitude have not been examined. Thus, the present experiments aimed to fill this gap in the literature. In Experiment 1, rats pressed levers for single-pellet reinforcers during Phase 1. In Phase 2, target-lever pressing was extinguished, and alternative-lever pressing produced either five-pellet, one-pellet, or no alternative reinforcement. In Phase 3, alternative reinforcement was suspended to test for resurgence. Five-pellet alternative reinforcement produced faster elimination and greater resurgence of target-lever pressing than one-pellet alternative reinforcement. In Experiment 2, effects of decreasing alternative-reinforcer magnitude on resurgence were examined. Rats pressed levers and pulled chains for six-pellet reinforcers during Phases 1 and 2, respectively. In Phase 3, alternative reinforcement was decreased to three pellets for one group, one pellet for a second group, and suspended altogether for a third group. Shifting from six-pellet to one-pellet alternative reinforcement produced as much resurgence as suspending alternative reinforcement altogether, while shifting from six pellets to three pellets did not produce resurgence. These results suggest that alternative-reinforcer magnitude has effects on elimination and resurgence of target behavior that are similar to those of alternative-reinforcer rate. Thus, both suppression of target behavior during alternative reinforcement and resurgence when conditions of alternative reinforcement are altered may be related to variables that affect the value of the alternative-reinforcement source. PMID:28194793
Modeling OPC complexity for design for manufacturability
NASA Astrophysics Data System (ADS)
Gupta, Puneet; Kahng, Andrew B.; Muddu, Swamy; Nakagawa, Sam; Park, Chul-Hong
2005-11-01
Increasing design complexity in sub-90nm designs results in increased mask complexity and cost. Resolution enhancement techniques (RET) such as assist feature addition, phase shifting (attenuated PSM) and aggressive optical proximity correction (OPC) help in preserving feature fidelity in silicon but increase mask complexity and cost. Data volume increase with rise in mask complexity is becoming prohibitive for manufacturing. Mask cost is determined by mask write time and mask inspection time, which are directly related to the complexity of features printed on the mask. Aggressive RET increase complexity by adding assist features and by modifying existing features. Passing design intent to OPC has been identified as a solution for reducing mask complexity and cost in several recent works. The goal of design-aware OPC is to relax OPC tolerances of layout features to minimize mask cost, without sacrificing parametric yield. To convey optimal OPC tolerances for manufacturing, design optimization should drive OPC tolerance optimization using models of mask cost for devices and wires. Design optimization should be aware of impact of OPC correction levels on mask cost and performance of the design. This work introduces mask cost characterization (MCC) that quantifies OPC complexity, measured in terms of fracture count of the mask, for different OPC tolerances. MCC with different OPC tolerances is a critical step in linking design and manufacturing. In this paper, we present a MCC methodology that provides models of fracture count of standard cells and wire patterns for use in design optimization. MCC cannot be performed by designers as they do not have access to foundry OPC recipes and RET tools. To build a fracture count model, we perform OPC and fracturing on a limited set of standard cells and wire configurations with all tolerance combinations. Separately, we identify the characteristics of the layout that impact fracture count. Based on the fracture count (FC) data from OPC and mask data preparation runs, we build models of FC as function of OPC tolerances and layout parameters.
Wavelet filtered shifted phase-encoded joint transform correlation for face recognition
NASA Astrophysics Data System (ADS)
Moniruzzaman, Md.; Alam, Mohammad S.
2017-05-01
A new wavelet-filtered-based Shifted- phase-encoded Joint Transform Correlation (WPJTC) technique has been proposed for efficient face recognition. The proposed technique uses discrete wavelet decomposition for preprocessing and can effectively accommodate various 3D facial distortions, effects of noise, and illumination variations. After analyzing different forms of wavelet basis functions, an optimal method has been proposed by considering the discrimination capability and processing speed as performance trade-offs. The proposed technique yields better correlation discrimination compared to alternate pattern recognition techniques such as phase-shifted phase-encoded fringe-adjusted joint transform correlator. The performance of the proposed WPJTC has been tested using the Yale facial database and extended Yale facial database under different environments such as illumination variation, noise, and 3D changes in facial expressions. Test results show that the proposed WPJTC yields better performance compared to alternate JTC based face recognition techniques.
Lithography-based automation in the design of program defect masks
NASA Astrophysics Data System (ADS)
Vakanas, George P.; Munir, Saghir; Tejnil, Edita; Bald, Daniel J.; Nagpal, Rajesh
2004-05-01
In this work, we are reporting on a lithography-based methodology and automation in the design of Program Defect masks (PDM"s). Leading edge technology masks have ever-shrinking primary features and more pronounced model-based secondary features such as optical proximity corrections (OPC), sub-resolution assist features (SRAF"s) and phase-shifted mask (PSM) structures. In order to define defect disposition specifications for critical layers of a technology node, experience alone in deciding worst-case scenarios for the placement of program defects is necessary but may not be sufficient. MEEF calculations initiated from layout pattern data and their integration in a PDM layout flow provide a natural approach for improvements, relevance and accuracy in the placement of programmed defects. This methodology provides closed-loop feedback between layout and hard defect disposition specifications, thereby minimizing engineering test restarts, improving quality and reducing cost of high-end masks. Apart from SEMI and industry standards, best-known methods (BKM"s) in integrated lithographically-based layout methodologies and automation specific to PDM"s are scarce. The contribution of this paper lies in the implementation of Design-For-Test (DFT) principles to a synergistic interaction of CAD Layout and Aerial Image Simulator to drive layout improvements, highlight layout-to-fracture interactions and output accurate program defect placement coordinates to be used by tools in the mask shop.
Modeling and Observations of Phase-Mask Trapezoidal Profiles with Grating-Fiber Image Reproduction
NASA Technical Reports Server (NTRS)
Lyons, Donald R.; Lindesay, James V.; Lee, Hyung R.; Ndlela, Zolili U.; Thompso, Erica J.
2000-01-01
We report on an investigation of the trapezoidal design and fabrication defects in phase masks used to produce Bragg reflection gratings in optical fibers. We used a direct visualization technique to examine the nonuniformity of the interference patterns generated by several phase masks. Fringe patterns from the phase masks are compared with the analogous patterns resulting from two-beam interference. Atomic force microscope imaging of the actual phase gratings that give rise to anomalous fringe patterns is used to determine input parameters for a general theoretical model. Phase masks with pitches of 0.566 and 1.059 microns are modeled and investigated.
System for interferometric distortion measurements that define an optical path
Bokor, Jeffrey; Naulleau, Patrick
2003-05-06
An improved phase-shifting point diffraction interferometer can measure both distortion and wavefront aberration. In the preferred embodiment, the interferometer employs an object-plane pinhole array comprising a plurality of object pinholes located between the test optic and the source of electromagnetic radiation and an image-plane mask array that is positioned in the image plane of the test optic. The image-plane mask array comprises a plurality of test windows and corresponding reference pinholes, wherein the positions of the plurality of pinholes in the object-plane pinhole array register with those of the plurality of test windows in image-plane mask array. Electromagnetic radiation that is directed into a first pinhole of object-plane pinhole array thereby creating a first corresponding test beam image on the image-plane mask array. Where distortion is relatively small, it can be directly measured interferometrically by measuring the separation distance between and the orientation of the test beam and reference-beam pinhole and repeating this process for at least one other pinhole of the plurality of pinholes of the object-plane pinhole array. Where the distortion is relative large, it can be measured by using interferometry to direct the stage motion, of a stage supporting the image-plane mask array, and then use the final stage motion as a measure of the distortion.
NASA Astrophysics Data System (ADS)
Lee, Seung Seok; Kim, Ju Ha; Choi, Eun Seo
2017-04-01
We proposed novel phase-shifting interferometry using a fiber-optic vibration sensor. The Doppler shift in the coiled fiber caused by vibrations can be used to detect the vibrations by using a fiber-optic interferometer. The principle can be applied to induce phase shifts. While applying vibrations to the coiled fiber at various vibration frequencies, we recorded the variations in the interference fringes. The interference fringe moved to longer wavelengths when a vibration frequency was increased from 38.00 to 38.40 kHz. Phase variations of 3.59 rad/kHz were obtained. The ability to accurately control the phase by using the vibrations in the coiled fiber was demonstrated by the elimination of the depth degeneracy using the complex signal generated by the phase-shifted interference fringes. Using vibrations to control phase shifting can be an acceptable alternative to conventional methods and can be applied to resolve the depth ambiguity in Fourier domain optical coherence tomography.
An alternative method of fabricating sub-micron resolution masks using excimer laser ablation
NASA Astrophysics Data System (ADS)
Hayden, C. J.; Eijkel, J. C. T.; Dalton, C.
2004-06-01
In the work presented here, an excimer laser micromachining system has been used successfully to fabricate high-resolution projection and contact masks. The contact masks were subsequently used to produce chrome-gold circular ac electro-osmotic pump (cACEOP) microelectrode arrays on glass substrates, using a conventional contact photolithography process. The contact masks were produced rapidly (~15 min each) and were found to be accurate to sub-micron resolution, demonstrating an alternative route for mask fabrication. Laser machined masks were also used in a laser-projection system, demonstrating that such fabrication techniques are also suited to projection lithography. The work addresses a need for quick reproduction of high-resolution contact masks, given their rapid degradation when compared to non-contact masks.
NASA Astrophysics Data System (ADS)
Huang, M. J.; Liu, Zhao-Cheng; Jhang, Jhen-Huei
2002-11-01
This study demonstrates the feasibility of applying phase-shifting electronic speckle pattern interfometry to measure the deformation field of the front panel of a cathode ray tube, to support analysis to enhance the implosion-resistance capacity under violent collapse. Two effects, the air exhaustion and shrink band constraint effects, are comprehensively investigated. The angle of an adjustable mirror is switched, to provide three sensitivity vectors that are required in 3D-displacement measurement. A Fourier filtration is employed to remove speckle noise and establish a noise-free phase map. Inconsistent points are identified and masked to prevent any possible divergence during phase unwrapping. The results show that the accuracy of this method is satisfactory.
Behavioral and Genetic Dissection of a Mouse Model for Advanced Sleep Phase Syndrome
Jiang, Peng; Striz, Martin; Wisor, Jonathan P.; O'Hara, Bruce F.
2011-01-01
Study Objective: The adaptive value of the endogenous circadian clock arises from its ability to synchronize (i.e., entrain) to external light-dark (LD) cycles at an appropriate phase. Studies have suggested that advanced circadian phase alignment might result from shortening of the period length of the clock. Here we explore mechanisms that contribute to an early activity phase in CAST/EiJ (CAST) mice. Methods: We investigated circadian rhythms of wheel-running activity in C57BL/6J (B6), CAST and 2 strains of B6.CAST congenic mice, which carry CAST segments introgressed in a B6 genome. Results: When entrained, all CAST mice initiate daily activity several hours earlier than normal mice. This difference could not be explained by alterations in the endogenous period, as activity onset did not correlate with period length. However, the photic phase-shifting responses in these mice were phase-lagged by 3 hours relative to their activity. Attenuated light masking responses were also found in CAST mice, which allow for activity normally inhibited by light. A previously identified quantitative trait locus (QTL), Era1, which contributes to the early activity trait, was confirmed and refined here using two B6.CAST congenic strains. Surprisingly, these B6.CAST mice exhibited longer rather than shorter endogenous periods, further demonstrating that the advanced phase in these mice is not due to alterations in period. Conclusions: CAST mice have an advanced activity phase similar to human advanced sleep phase syndrome. This advanced phase is not due to its shorter period length or smaller light-induced phase shifts, but appears to be related to both light masking and altered coupling of the circadian pacemaker with various outputs. Lastly, a QTL influencing this trait was confirmed and narrowed using congenic mice as a first step toward gene identification. Citation: Jiang P; Striz M; Wisor JP; O'Hara BF. Behavioral and genetic dissection of a mouse model for advanced sleep phase syndrome. SLEEP 2011;34(1):39-48. PMID:21203370
Oral contraceptives positively affect mood in healthy PMS-free women: A longitudinal study.
Hamstra, Danielle A; de Kloet, E Ronald; de Rover, Mischa; Van der Does, Willem
2017-12-01
Menstrual cycle phase and oral contraceptives (OC) use influence mood and cognition and these effects may be moderated by the mineralocorticoid receptor (MR) genotype. The effect of menstrual cycle phase on mood may be increased if participants know that this is the focus of study. We assessed aspects associated with reproductive depression such as mood, interpersonal sensitivity, affect lability and depressive cognitions in MR-genotyped OC-users and naturally cycling (NC) women in a carefully masked design. A homogenous sample of healthy, PMS-free, pre-menopausal MR-genotyped women (n=92) completed online questionnaires eight times during two consecutive cycles. The masking of the research question was successful. OC-users did not differ significantly from NC women in positive and negative affect at the time of assessment, personality characteristics (e.g. neuroticism) or mental and physical health. Both groups reported more shifts in anger in the first cycle week (p<0.001; η p 2 =0.08). Compared to NC women, OC-users reported fewer mood-shifts between depression and elation in the mid-luteal phase of the menstrual cycle (p=0.002; η p 2 =0.10) and had fewer ruminating thoughts at all phases (p=0.003; η p 2 =0.11). Effects of MR-genotype were not significant after correction for multiple comparisons. OC users scored more favorably on measures associated with reproductive depression. OC users also showed a decreased affect variability possibly indicating an emotional blunting effect, which is in line with previous reports on affect-stabilizing effects of OC. Limitations were loss of cases due to irregularities in the menstrual cycle length and possible confounding by the 'survivor effect', since almost all OC-users took OC for more than a year. Copyright © 2017 Elsevier Inc. All rights reserved.
Phase-shift/transmittance measurements in a micro pattern using MPM193EX
NASA Astrophysics Data System (ADS)
Nozawa, Hiroto; Ishida, Takayuki; Kato, Satoru; Sato, Osamu; Miyazaki, Koji; Takehisa, Kiwamu; Awamura, Naoki; Takizawa, Hideo; Kusunose, Hal
2009-04-01
A new direct Phase-shift/Transmittance measurement tool "MPM193EX" has been developed to respond to the growing demand for higher precision measurements of finer patterns in ArF Lithography. Specifications of MPM193EX are listed below along with corresponding specifications of the conventional tool MPM193. 1) Phase-shift [3 Sigma]: 0.5 deg. (MPM193) => 0.2 deg. (MPM193EX) 2) Transmittance [3 Sigma]: 0.20 % (MPM193) => 0.04 % (MPM193EX) 3) Minimum measurement pattern width: 7.5 μm (MPM193) => 1.0 μm (MPM193EX) Furthermore, new design optics using an ArF Laser and an objective lens with long working distance allows measurements of masks with pellicles. The new method for improving the measurement repeatability is based on elimination of influence from instantaneous fluctuation in interferometer fringes by scanning two adjacent areas simultaneously. Also, MPM193EX is equipped with high-resolution and stable optics. The newly employed auto-focus system in MPM193EX accurately adjusts, by a new image processing method using high-resolution optics, the focus height that is one of the most important factors for measurements in a micro pattern.
Validation of optical codes based on 3D nanostructures
NASA Astrophysics Data System (ADS)
Carnicer, Artur; Javidi, Bahram
2017-05-01
Image information encoding using random phase masks produce speckle-like noise distributions when the sample is propagated in the Fresnel domain. As a result, information cannot be accessed by simple visual inspection. Phase masks can be easily implemented in practice by attaching cello-tape to the plain-text message. Conventional 2D-phase masks can be generalized to 3D by combining glass and diffusers resulting in a more complex, physical unclonable function. In this communication, we model the behavior of a 3D phase mask using a simple approach: light is propagated trough glass using the angular spectrum of plane waves whereas the diffusor is described as a random phase mask and a blurring effect on the amplitude of the propagated wave. Using different designs for the 3D phase mask and multiple samples, we demonstrate that classification is possible using the k-nearest neighbors and random forests machine learning algorithms.
Temporal phase mask encrypted optical steganography carried by amplified spontaneous emission noise.
Wu, Ben; Wang, Zhenxing; Shastri, Bhavin J; Chang, Matthew P; Frost, Nicholas A; Prucnal, Paul R
2014-01-13
A temporal phase mask encryption method is proposed and experimentally demonstrated to improve the security of the stealth channel in an optical steganography system. The stealth channel is protected in two levels. In the first level, the data is carried by amplified spontaneous emission (ASE) noise, which cannot be detected in either the time domain or spectral domain. In the second level, even if the eavesdropper suspects the existence of the stealth channel, each data bit is covered by a fast changing phase mask. The phase mask code is always combined with the wide band noise from ASE. Without knowing the right phase mask code to recover the stealth data, the eavesdropper can only receive the noise like signal with randomized phase.
On the benefit of high resolution and low aberrations for in-die mask registration metrology
NASA Astrophysics Data System (ADS)
Beyer, Dirk; Seidel, Dirk; Heisig, Sven; Steinert, Steffen; Töpfer, Susanne; Scherübl, Thomas; Hetzler, Jochen
2014-10-01
With the introduction of complex lithography schemes like double and multi - patterning and new design principles like gridded designs with cut masks the requirements for mask to mask overlay have increased dramatically. Still, there are some good news too for the mask industry since more mask are needed and qualified. Although always confronted with throughput demands, latest writing tool developments are able to keep pace with ever increasing pattern placement specs not only for global signatures but for in-die features within the active area. Placement specs less than 3nm (max. 3 Sigma) are expected and needed in all cases in order to keep the mask contribution to the overall overlay budget at an accepted level. The qualification of these masks relies on high precision metrology tools which have to fulfill stringent metrology as well as resolution constrains at the same time. Furthermore, multi-patterning and gridded designs with pinhole type cut masks are drivers for a paradigm shift in registration metrology from classical registration crosses to in-die registration metrology on production features. These requirements result in several challenges for registration metrology tools. The resolution of the system must be sufficiently high to resolve small production features. At the same time tighter repeatability is required. Furthermore, tool induced shift (TIS) limit the accuracy of in-die measurements. This paper discusses and demonstrates the importance of low illumination wavelength together with low aberrations for best contrast imaging for in-die registration metrology. Typical effects like tool induced shift are analyzed and evaluated using the ZEISS PROVE® registration metrology tool. Additionally, we will address performance gains when going to higher resolution. The direct impact on repeatability for small features by registration measurements will be discussed as well.
Application of advanced structure to multi-tone mask for FPD process
NASA Astrophysics Data System (ADS)
Song, Jin-Han; Jeong, Jin-Woong; Kim, Kyu-Sik; Jeong, Woo-Gun; Yun, Sang-Pil; Lee, Dong-Heok; Choi, Sang-Soo
2017-07-01
In accordance with improvement of FPD technology, masks such as phase shift mask (PSM) and multi-tone mask (MTM) for a particular purpose also have been developed. Above all, the MTM consisted of more than tri-tone transmittance has a substantial advantage which enables to reduce the number of mask demand in FPD fabrication process contrast to normal mask of two-tone transmittance.[1,2] A chromium (Cr)-based MTM (Typically top type) is being widely employed because of convenience of etch process caused by its only Cr-based structure consisted of Cr absorber layer and Cr half-tone layer. However, the top type of Cr-based MTM demands two Cr sputtering processes after each layer etching process and writing process. For this reason, a different material from the Cr-based MTM is required for reduction of mask fabrication time and cost. In this study, we evaluate a MTM which has a structure combined Cr with molybdenum silicide (MoSi) to resolve the issues mentioned above. The MoSi which is demonstrated by integrated circuit (IC) process is a suitable material for MTM evaluation. This structure could realize multi-transmittance in common with the Cr-based MTM. Moreover, it enables to reduce the number of sputtering process. We investigate a optimized structure upon consideration of productivity along with performance such as critical dimension (CD) variation and transmittance range of each structure. The transmittance is targeted at h-line wavelength (405 nm) in the evaluation. Compared with Cr-based MTM, the performances of all Cr-/MoSi-based MTMs are considered.
65-nm full-chip implementation using double dipole lithography
NASA Astrophysics Data System (ADS)
Hsu, Stephen D.; Chen, J. Fung; Cororan, Noel; Knose, William T.; Van Den Broeke, Douglas J.; Laidig, Thomas L.; Wampler, Kurt E.; Shi, Xuelong; Hsu, Michael; Eurlings, Mark; Finders, Jo; Chiou, Tsann-Bim; Socha, Robert J.; Conley, Will; Hsieh, Yen W.; Tuan, Steve; Hsieh, Frank
2003-06-01
Double Dipole Lithography (DDL) has been demonstrated to be capable of patterning complex 2D patterns. Due to inherently high aerial imaging contrast, especially for dense features, we have found that it has a very good potential to meet manufacturing requirements for the 65nm node using ArF binary chrome masks. For patterning in the k1<0.35 regime without resorting to hard phase-shift masks (PSMs), DDL is one unique Resolution Enhancement Technique (RET) which can achieve an acceptable process window. To utilize DDL for printing actual IC devices, the original design data must be decomposed into "vertical (V)" and "horizontal (H)" masks for the respective X- and Y-dipole exposures. An improved two-pass, model-based, DDL mask data processing methodology has been established. It is capable of simultaneously converting complex logic and memory mask patterns into DDL compatible mask layout. To maximize the overlapped process window area, we have previously shown that the pattern-shielding algorithm must be intelligently applied together with both Scattering Bars (SBs) and model-based OPC (MOPC). Due to double exposures, stray light must be well-controlled to ensure uniform printing across the entire chip. One solution to minimize stray light is to apply large patches of solid chrome in open areas to reduce the background transmission during exposure. Unfortunately, this is not feasible for a typical clear-field poly gate masks to be patterned by a positive resist process. In this work, we report a production-worthy DDL mask pattern decomposition scheme for full-chip application. A new generation of DDL technology reticle set has been developed to verify the printing performance. Shielding is a critical part of the DDL. An innovative shielding scheme has been developed to protect the critical features and minimize the impact of stray light during double exposure.
Modulating complex beams in amplitude and phase using fast tilt-micromirror arrays and phase masks.
Roth, Matthias; Heber, Jörg; Janschek, Klaus
2018-06-15
The Letter proposes a system for the spatial modulation of light in amplitude and phase at kilohertz frame rates and high spatial resolution. The focus is fast spatial light modulators (SLMs) consisting of continuously tiltable micromirrors. We investigate the utilization of such SLMs in combination with a static phase mask in a 4f setup. The phase mask enables the complex beam modulation in a linear optical arrangement. Furthermore, adding so-called phase steps to the phase mask increases both the number of image pixels at constant SLM resolution and the optical efficiency. We illustrate our concept based on numerical simulations.
NASA Astrophysics Data System (ADS)
Mehta, Sohan S.; Ganta, Lakshmi K.; Chauhan, Vikrant; Wu, Yixu; Singh, Sunil; Ann, Chia; Subramany, Lokesh; Higgins, Craig; Erenturk, Burcin; Srivastava, Ravi; Singh, Paramjit; Koh, Hui Peng; Cho, David
2015-03-01
Immersion based 20nm technology node and below becoming very challenging to chip designers, process and integration due to multiple patterning to integrate one design layer . Negative tone development (NTD) processes have been well accepted by industry experts for enabling technologies 20 nm and below. 193i double patterning is the technology solution for pitch down to 80 nm. This imposes tight control in critical dimension(CD) variation in double patterning where design patterns are decomposed in two different masks such as in litho-etch-litho etch (LELE). CD bimodality has been widely studied in LELE double patterning. A portion of CD tolerance budget is significantly consumed by variations in CD in double patterning. The objective of this work is to study the process variation challenges and resolution in the Negative Tone Develop Process for 20 nm and Below Technology Node. This paper describes the effect of dose slope on CD variation in negative tone develop LELE process. This effect becomes even more challenging with standalone NTD developer process due to q-time driven CD variation. We studied impact of different stacks with combination of binary and attenuated phase shift mask and estimated dose slope contribution individually from stack and mask type. Mask 3D simulation was carried out to understand theoretical aspect. In order to meet the minimum insulator requirement for the worst case on wafer the overlay and critical dimension uniformity (CDU) budget margins have slimmed. Besides the litho process and tool control using enhanced metrology feedback, the variation control has other dependencies too. Color balancing between the two masks in LELE is helpful in countering effects such as iso-dense bias, and pattern shifting. Dummy insertion and the improved decomposition techniques [2] using multiple lower priority constraints can help to a great extent. Innovative color aware routing techniques [3] can also help with achieving more uniform density and color balanced layouts.
Yuan, Liang Leon; Herman, Peter R
2015-12-21
A multi-level nanophotonic structure is a major goal in providing advanced optical functionalities as found in photonic crystals and metamaterials. A three-level nano-grating phase mask has been fabricated in an electron-beam resist (ma-N) to meet the requirement of holographic generation of a diamond-like 3D nanostructure in photoresist by a single exposure step. A 2D mask with 600 nm periodicity is presented for generating first order diffracted beams with a preferred π/2 phase shift on the X- and Y-axes and with sufficient 1(st) order diffraction efficiency of 3.5% at 800 nm wavelength for creating a 3D periodic nanostructure in SU-8 photoresist. The resulting 3D structure is anticipated to provide an 8% complete photonic band gap (PBG) upon silicon inversion. A thin SiO2 layer was used to isolate the grating layers and multiple spin-coating steps served to planarize the final resist layer. A reversible soft coating (aquaSAVE) was introduced to enable SEM inspection and verification of each insulating grating layer. This e-beam lithographic method is extensible to assembling multiple layers of a nanophotonic structure.
DOT National Transportation Integrated Search
1967-05-01
The report describes evaluation of two prototype phase dilution rebreathing masks as compared to an open port rebreathing mask design. Human subjects wearing the prototype masks and engaged in three minute periods of rest and exercise were exposed to...
Cluster tool solution for fabrication and qualification of advanced photomasks
NASA Astrophysics Data System (ADS)
Schaetz, Thomas; Hartmann, Hans; Peter, Kai; Lalanne, Frederic P.; Maurin, Olivier; Baracchi, Emanuele; Miramond, Corinne; Brueck, Hans-Juergen; Scheuring, Gerd; Engel, Thomas; Eran, Yair; Sommer, Karl
2000-07-01
The reduction of wavelength in optical lithography, phase shift technology and optical proximity correction (OPC), requires a rapid increase in cost effective qualification of photomasks. The knowledge about CD variation, loss of pattern fidelity especially for OPC pattern and mask defects concerning the impact on wafer level is becoming a key issue for mask quality assessment. As part of the European Community supported ESPRIT projection 'Q-CAP', a new cluster concept has been developed, which allows the combination of hardware tools as well as software tools via network communication. It is designed to be open for any tool manufacturer and mask hose. The bi-directional network access allows the exchange of all relevant mask data including grayscale images, measurement results, lithography parameters, defect coordinates, layout data, process data etc. and its storage to a SQL database. The system uses SEMI format descriptions as well as standard network hardware and software components for the client server communication. Each tool is used mainly to perform its specific application without using expensive time to perform optional analysis, but the availability of the database allows each component to share the full data ste gathered by all components. Therefore, the cluster can be considered as one single virtual tool. The paper shows the advantage of the cluster approach, the benefits of the tools linked together already, and a vision of a mask house in the near future.
Edge-illumination x-ray phase contrast imaging with Pt-based metallic glass masks
NASA Astrophysics Data System (ADS)
Saghamanesh, Somayeh; Aghamiri, Seyed Mahmoud-Reza; Olivo, Alessandro; Sadeghilarijani, Maryam; Kato, Hidemi; Kamali-Asl, Alireza; Yashiro, Wataru
2017-06-01
Edge-illumination x-ray phase contrast imaging (EI XPCI) is a non-interferometric phase-sensitive method where two absorption masks are employed. These masks are fabricated through a photolithography process followed by electroplating which is challenging in terms of yield as well as time- and cost-effectiveness. We report on the first implementation of EI XPCI with Pt-based metallic glass masks fabricated by an imprinting method. The new tested alloy exhibits good characteristics including high workability beside high x-ray attenuation. The fabrication process is easy and cheap, and can produce large-size masks for high x-ray energies within minutes. Imaging experiments show a good quality phase image, which confirms the potential of these masks to make the EI XPCI technique widely available and affordable.
Dipolar recoupling in solid state NMR by phase alternating pulse sequences
Lin, J.; Bayro, M.; Griffin, R. G.; Khaneja, N.
2009-01-01
We describe some new developments in the methodology of making heteronuclear and homonuclear recoupling experiments in solid state NMR insensitive to rf-inhomogeneity by phase alternating the irradiation on the spin system every rotor period. By incorporating delays of half rotor periods in the pulse sequences, these phase alternating experiments can be made γ encoded. The proposed methodology is conceptually different from the standard methods of making recoupling experiments robust by the use of ramps and adiabatic pulses in the recoupling periods. We show how the concept of phase alternation can be incorporated in the design of homonuclear recoupling experiments that are both insensitive to chemical-shift dispersion and rf-inhomogeneity. PMID:19157931
The role of alternative Polyadenylation in regulation of rhythmic gene expression.
Ptitsyna, Natalia; Boughorbel, Sabri; El Anbari, Mohammed; Ptitsyn, Andrey
2017-08-04
Alternative transcription is common in eukaryotic cells and plays important role in regulation of cellular processes. Alternative polyadenylation results from ambiguous PolyA signals in 3' untranslated region (UTR) of a gene. Such alternative transcripts share the same coding part, but differ by a stretch of UTR that may contain important functional sites. The methodoogy of this study is based on mathematical modeling, analytical solution, and subsequent validation by datamining in multiple independent experimental data from previously published studies. In this study we propose a mathematical model that describes the population dynamics of alternatively polyadenylated transcripts in conjunction with rhythmic expression such as transcription oscillation driven by circadian or metabolic oscillators. Analysis of the model shows that alternative transcripts with different turnover rates acquire a phase shift if the transcript decay rate is different. Difference in decay rate is one of the consequences of alternative polyadenylation. Phase shift can reach values equal to half the period of oscillation, which makes alternative transcripts oscillate in abundance in counter-phase to each other. Since counter-phased transcripts share the coding part, the rate of translation becomes constant. We have analyzed a few data sets collected in circadian timeline for the occurrence of transcript behavior that fits the mathematical model. Alternative transcripts with different turnover rate create the effect of rectifier. This "molecular diode" moderates or completely eliminates oscillation of individual transcripts and stabilizes overall protein production rate. In our observation this phenomenon is very common in different tissues in plants, mice, and humans. The occurrence of counter-phased alternative transcripts is also tissue-specific and affects functions of multiple biological pathways. Accounting for this mechanism is important for understanding the natural and engineering the synthetic cellular circuits.
Enhancing Tabletop X-Ray Phase Contrast Imaging with Nano-Fabrication
Miao, Houxun; Gomella, Andrew A.; Harmon, Katherine J.; Bennett, Eric E.; Chedid, Nicholas; Znati, Sami; Panna, Alireza; Foster, Barbara A.; Bhandarkar, Priya; Wen, Han
2015-01-01
X-ray phase-contrast imaging is a promising approach for improving soft-tissue contrast and lowering radiation dose in biomedical applications. While current tabletop imaging systems adapt to common x-ray tubes and large-area detectors by employing absorptive elements such as absorption gratings or monolithic crystals to filter the beam, we developed nanometric phase gratings which enable tabletop x-ray far-field interferometry with only phase-shifting elements, leading to a substantial enhancement in the performance of phase contrast imaging. In a general sense the method transfers the demands on the spatial coherence of the x-ray source and the detector resolution to the feature size of x-ray phase masks. We demonstrate its capabilities in hard x-ray imaging experiments at a fraction of clinical dose levels and present comparisons with the existing Talbot-Lau interferometer and with conventional digital radiography. PMID:26315891
NASA Technical Reports Server (NTRS)
McClanahan, T. P.; Mitrofanov, I. G.; Boynton, W. V.; Chin, G.; Livengood, T.; Starr, R. D.; Evans, L. G.; Mazarico, E.; Smith, D. E.
2012-01-01
We present a method and preliminary results related to determining the spatial resolution of orbital neutron detectors using epithermal maps and differential topographic masks. Our technique is similar to coded aperture imaging methods for optimizing photonic signals in telescopes [I]. In that approach photon masks with known spatial patterns in a telescope aperature are used to systematically restrict incoming photons which minimizes interference and enhances photon signal to noise. Three orbital neutron detector systems with different stated spatial resolutions are evaluated. The differing spatial resolutions arise due different orbital altitudes and the use of neutron collimation techniques. 1) The uncollimated Lunar Prospector Neutron Spectrometer (LPNS) system has spatial resolution of 45km FWHM from approx. 30km altitude mission phase [2]. The Lunar Rennaissance Orbiter (LRO) Lunar Exploration Neutron Detector (LEND) with two detectors at 50km altitude evaluated here: 2) the collimated 10km FWHM spatial resolution detector CSETN and 3) LEND's collimated Sensor for Epithermal Neutrons (SETN). Thus providing two orbital altitudes to study factors of: uncollimated vs collimated and two average altitudes for their effect on fields-of-view.
Simulation study of reticle enhancement technology applications for 157-nm lithography
NASA Astrophysics Data System (ADS)
Schurz, Dan L.; Flack, Warren W.; Karklin, Linard
2002-03-01
The acceleration of the International Technology Roadmap for Semiconductors (ITRS) is placing significant pressure on the industry's infrastructure, particularly the lithography equipment. As recently as 1997, there was no optical solution offered past the 130 nm design node. The current roadmap has the 65 nm node (reduced from 70 nm) pulled in one year to 2007. Both 248 nm and 193 nm wavelength lithography tools will be pushed to their practical resolution limits in the near term. Very high numerical aperture (NA) 193 nm exposure tools in conjunction with resolution enhancement techniques (RET) will postpone the requirement for 157 nm lithography in manufacturing. However, ICs produced at 70 nm design rules with manufacturable k 1 values will require that 157 nm wavelength lithography tools incorporate the same RETs utilized in 248nm, and 193 nm tools. These enhancements will include Alternating Phase Shifting Masks (AltPSM) and Optical Proximity Correction (OPC) on F 2 doped quartz reticle substrates. This study investigates simulation results when AltPSM is applied to sub-100 nm test patterns in 157 nm lithography in order to maintain Critical Dimension (CD) control for both nested and isolated geometries. Aerial image simulations are performed for a range of numerical apertures, chrome regulators, gate pitches and gate widths. The relative performance for phase shifted versus binary structures is also compared. Results are demonstrated in terms of aerial image contrast and process window changes. The results clearly show that a combination of high NA and RET is necessary to achieve usable process windows for 70 nm line/space structures. In addition, it is important to consider two-dimensional proximity effects for sub-100 nm gate structures.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Webb, Aaron P.; Carlson, Charles T.; Weaver, William T.
A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered ontomore » the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.« less
NASA Astrophysics Data System (ADS)
Zhao, Hui; Wei, Jingxuan
2014-09-01
The key to the concept of tunable wavefront coding lies in detachable phase masks. Ojeda-Castaneda et al. (Progress in Electronics Research Symposium Proceedings, Cambridge, USA, July 5-8, 2010) described a typical design in which two components with cosinusoidal phase variation operate together to make defocus sensitivity tunable. The present study proposes an improved design and makes three contributions: (1) A mathematical derivation based on the stationary phase method explains why the detachable phase mask of Ojeda-Castaneda et al. tunes the defocus sensitivity. (2) The mathematical derivations show that the effective bandwidth wavefront coded imaging system is also tunable by making each component of the detachable phase mask move asymmetrically. An improved Fisher information-based optimization procedure was also designed to ascertain the optimal mask parameters corresponding to specific bandwidth. (3) Possible applications of the tunable bandwidth are demonstrated by simulated imaging.
Method for mask repair using defect compensation
Sweeney, Donald W.; Ray-Chaudhuri, Avijit K.
2001-01-01
A method for repair of amplitude and/or phase defects in lithographic masks. The method involves modifying or altering a portion of the absorber pattern on the surface of the mask blank proximate to the mask defect to compensate for the local disturbance (amplitude or phase) of the optical field due to the defect.
Central masking with bilateral cochlear implants
Lin, Payton; Lu, Thomas; Zeng, Fan-Gang
2013-01-01
Across bilateral cochlear implants, contralateral threshold shift has been investigated as a function of electrode difference between the masking and probe electrodes. For contralateral electric masking, maximum threshold elevations occurred when the position of the masker and probe electrode was approximately place-matched across ears. The amount of masking diminished with increasing masker-probe electrode separation. Place-dependent masking occurred in both sequentially implanted ears, and was not affected by the masker intensity or the time delay from the masker onset. When compared to previous contralateral masking results in normal hearing, the similarities between place-dependent central masking patterns suggest comparable mechanisms of overlapping excitation in the central auditory nervous system. PMID:23363113
Mechanics of Cell Crawling by Means of Force-free Cyclic Motion
NASA Astrophysics Data System (ADS)
Tarama, Mitsusuke; Yamamoto, Ryoichi
2018-04-01
The mechanics of crawling cells on a substrate is investigated by using a minimal model that satisfies the force-free condition. A cell is described by two subcellular elements connected by a linear actuator that changes the length of the cell cyclically in time, together with periodic alternation of adhesive characters at the interface between the cell and the substrate. Here the key model parameters are the phase shifts between the elongation of the actuator and the alternation of the adhesion of the two elements. We emphasize that the phase shifts determine not only the efficiency of the crawling motion but also its direction.
High-charge and multiple-star vortex coronagraphy from stacked vector vortex phase masks.
Aleksanyan, Artur; Brasselet, Etienne
2018-02-01
Optical vortex phase masks are now installed at many ground-based large telescopes for high-contrast astronomical imaging. To date, such instrumental advances have been restricted to the use of helical phase masks of the lowest even order, while future giant telescopes will require high-order masks. Here we propose a single-stage on-axis scheme to create high-order vortex coronagraphs based on second-order vortex phase masks. By extending our approach to an off-axis design, we also explore the implementation of multiple-star vortex coronagraphy. An experimental laboratory demonstration is reported and supported by numerical simulations. These results offer a practical roadmap to the development of future coronagraphic tools with enhanced performances.
Weighted least-square approach for simultaneous measurement of multiple reflective surfaces
NASA Astrophysics Data System (ADS)
Tang, Shouhong; Bills, Richard E.; Freischlad, Klaus
2007-09-01
Phase shifting interferometry (PSI) is a highly accurate method for measuring the nanometer-scale relative surface height of a semi-reflective test surface. PSI is effectively used in conjunction with Fizeau interferometers for optical testing, hard disk inspection, and semiconductor wafer flatness. However, commonly-used PSI algorithms are unable to produce an accurate phase measurement if more than one reflective surface is present in the Fizeau interferometer test cavity. Examples of test parts that fall into this category include lithography mask blanks and their protective pellicles, and plane parallel optical beam splitters. The plane parallel surfaces of these parts generate multiple interferograms that are superimposed in the recording plane of the Fizeau interferometer. When using wavelength shifting in PSI the phase shifting speed of each interferogram is proportional to the optical path difference (OPD) between the two reflective surfaces. The proposed method is able to differentiate each underlying interferogram from each other in an optimal manner. In this paper, we present a method for simultaneously measuring the multiple test surfaces of all underlying interferograms from these superimposed interferograms through the use of a weighted least-square fitting technique. The theoretical analysis of weighted least-square technique and the measurement results will be described in this paper.
Reading a standing wave: figure-ground-alternation masking of primes in evaluative priming.
Bermeitinger, Christina; Kuhlmann, Michael; Wentura, Dirk
2012-09-01
We propose a new masking technique for masking word stimuli. Drawing on the phenomena of metacontrast and paracontrast, we alternately presented two prime displays of the same word with the background color in one display matching the font color in the other display and vice versa. The sequence of twenty alterations (spanning approx. 267 ms) was sandwich-masked by structure masks. Using this masking technique, we conducted evaluative priming experiments with positive and negative target and prime words. Significant priming effects were found - for primes and targets drawn from the same as well as from different word sets. Priming effects were independent of prime discrimination performance in direct tests and they were still significant after the sample was restricted to those participants who showed random responding in the direct test. Copyright © 2012 Elsevier Inc. All rights reserved.
NASA Technical Reports Server (NTRS)
Murakami, Naoshi; Nishikawa, Jun; Sakamoto, Moritsugu; Ise, Akitoshi; Oka, Kazuhiko; Baba, Naoshi; Murakami, Hiroshi; Tamura, Motohide; Traub, Wesley A.; Mawet, Dimitri;
2012-01-01
Photonic crystal, an artificial periodic nanostructure of refractive indices, is one of the attractive technologies for coronagraph focal-plane masks aiming at direct imaging and characterization of terrestrial extrasolar planets. We manufactured the eight-octant phase mask (8OPM) and the vector vortex mask (VVM) very precisely using the photonic crystal technology. Fully achromatic phase-mask coronagraphs can be realized by applying appropriate polarization filters to the masks. We carried out laboratory experiments of the polarization-filtered 8OPM coronagraph using the High-Contrast Imaging Testbed (HCIT), a state-of-the-art coronagraph simulator at the Jet Propulsion Laboratory (JPL). We report the experimental results of 10-8-level contrast across several wavelengths over 10% bandwidth around 800nm. In addition, we present future prospects and observational strategy for the photonic-crystal mask coronagraphs combined with differential imaging techniques to reach higher contrast. We proposed to apply a polarization-differential imaging (PDI) technique to the VVM coronagraph, in which we built a two-channel coronagraph using polarizing beam splitters to avoid a loss of intensity due to the polarization filters. We also proposed to apply an angular-differential imaging (ADI) technique to the 8OPM coronagraph. The 8OPM/ADI mode avoids an intensity loss due to a phase transition of the mask and provides a full field of view around central stars. We present results of preliminary laboratory demonstrations of the PDI and ADI observational modes with the phase-mask coronagraphs.
The reliability of melatonin synthesis as an indicator of the individual circadian phase position.
Roemer, Hermann C; Griefahn, Barbara; Kuenemund, Christa; Blaszkewicz, Meinolf; Gerngross, Heinz
2003-08-01
Melatonin synthesis occurs earlier in the morning than in the evening types who strictly adhere to their individual time schedule. This study tested whether melatonin profiles still separate between diurnal types who vary their individual rhythm or who are submitted to prescribed time schedules. Male and female students were observed during a constant routine in the laboratory (24-26 hours bed rest, 20 degrees C, <30 lux, hourly isocaloric diet) and soldiers who spent several days in a military hospital were observed during 12 hours (bed rest, <30 lux, normal meals). Salivary melatonin levels were determined hourly. In both studies, melatonin profiles occurred earlier in the morning than in the evening types. The difference was smaller in soldiers, thus conditioning contributes to the actual phase position but does not mask morningness. As morningness is related to the ability to cope with shift work, the melatonin onset can be used as a criterion when assigning a person to shift work.
NASA Astrophysics Data System (ADS)
Piron, P.; Delacroix, C.; Huby, E.; Mawet, D.; Karlsson, M.; Ruane, G.; Habraken, S.; Absil, O.; Surdej, J.
2015-09-01
The Annular Groove Phase Mask (AGPM) is a vectorial vortex phase mask. It acts as a half-wave plate with a radial fast axis orientation operating in the mid infrared domain. When placed at the focus of a telescope element provides a continuous helical phase ramp for an on axis sources, which creates the orbital angular momentum. Thanks to that phase, the intensity of the central source is canceled by a down-stream pupil stop, while the off axis sources are not affected. However due to experimental conditions the nulling is hardly perfect. To improve the null, a Mach-Zehnder interferometer containing Dove prisms differently oriented can be proposed to sort out light based on its orbital angular momentum (OAM). Thanks to the differential rotation of the beam, a π phase shift is achieved for the on axis light affected by a non zero OAM. Therefore the contrast between the star and its faint companion is enhanced. Nevertheless, due the Dove prisms birefringence, the performance of the interferometer is relatively poor. To solve this problem, we propose to add a birefringent wave-plate in each arm to compensate this birefringence. In this paper, we will develop the mathematical model of the wave front using the Jones formalism. The performance of the interferometer is at first computed for the simple version without the birefringent plate. Then the effect of the birefringent plate is be mathematically described and the performance is re-computed.
Cardoso-Leite, Pedro; Waszak, Florian
2014-07-01
A briefly flashed target stimulus can become "invisible" when immediately followed by a mask-a phenomenon known as backward masking, which constitutes a major tool in the cognitive sciences. One form of backward masking is termed metacontrast masking. It is generally assumed that in metacontrast masking, the mask suppresses activity on which the conscious perception of the target relies. This assumption biases conclusions when masking is used as a tool-for example, to study the independence between perceptual detection and motor reaction. This is because other models can account for reduced perceptual performance without requiring suppression mechanisms. In this study, we used signal detection theory to test the suppression model against an alternative view of metacontrast masking, referred to as the summation model. This model claims that target- and mask-related activations fuse and that the difficulty in detecting the target results from the difficulty to discriminate this fused response from the response produced by the mask alone. Our data support this alternative view. This study is not a thorough investigation of metacontrast masking. Instead, we wanted to point out that when a different model is used to account for the reduced perceptual performance in metacontrast masking, there is no need to postulate a dissociation between perceptual and motor responses to account for the data. Metacontrast masking, as implemented in the Fehrer-Raab situation, therefore is not a valid method to assess perceptual-motor dissociations.
Improved mask-based CD uniformity for gridded-design-rule lithography
NASA Astrophysics Data System (ADS)
Faivishevsky, Lev; Khristo, Sergey; Sagiv, Amir; Mangan, Shmoolik
2009-03-01
The difficulties encountered during lithography of state-of-the-art 2D patterns are formidable, and originate from the fact that deep sub-wavelength features are being printed. This results in a practical limit of k1 >=0.4 as well as a multitude of complex restrictive design rules, in order to mitigate or minimize lithographic hot spots. An alternative approach, that is gradually attracting the lithographic community's attention, restricts the design of critical layers to straight, dense lines (a 1D grid), that can be relatively easily printed using current lithographic technology. This is then followed by subsequent, less critical trimming stages to obtain circuit functionality. Thus, the 1D gridded approach allows hotspot-free, proximity-effect free lithography of ultra low- k1 features. These advantages must be supported by a stable CD control mechanism. One of the overriding parameters impacting CDU performance is photo mask quality. Previous publications have demonstrated that IntenCDTM - a novel, mask-based CDU mapping technology running on Applied Materials' Aera2TM aerial imaging mask inspection tool - is ideally fit for detecting mask-based CDU issues in 1D (L&S) patterned masks for memory production. Owing to the aerial nature of image formation, IntenCD directly probes the CD as it is printed on the wafer. In this paper we suggest that IntenCD is naturally fit for detecting mask-based CDU issues in 1D GDR masks. We then study a novel method of recovering and quantifying the physical source of printed CDU, using a novel implementation of the IntenCD technology. We demonstrate that additional, simple measurements, which can be readily performed on board the Aera2TM platform with minimal throughput penalty, may complement IntenCD and allow a robust estimation of the specific nature and strength of mask error source, such as pattern width variation or phase variation, which leads to CDU issues on the printed wafer. We finally discuss the roles played by IntenCD in advanced GDR mask production, starting with tight control over mask production process, continuing to mask qualification at mask shop and ending at in-line wafer CDU correction in fabs.
NASA Technical Reports Server (NTRS)
Sidiek, Erkin; Balasubramanian, Kunjithapatham
2007-01-01
Practical image-plane occulting masks required by high-contrast imaging systems such as the TPF-Coronagraph introduce phase errors into the transmitting beam., or, equivalently, diffracts the residual starlight into the area of the final image plane used for detecting exo-planets. Our group at JPL has recently proposed spatially Profiled metal masks that can be designed to have zero parasitic phase at the center wavelength of the incoming broadband light with small amounts of' 00 and phase dispersions at other wavelengths. Work is currently underway to design. fabricate and characterize such image-plane masks. In order to gain some understanding on the behaviors of these new imperfect band-limited occulting masks and clarify how such masks utilizing different metals or alloys compare with each other, we carried out some modeling and simulations on the contrast performance of the high-contrast imaging testbed (HCIT) at .JPL. In this paper we describe the details of our simulations and present our results.
Harris, Joseph A; Donohue, Sarah E; Schoenfeld, Mircea A; Hopf, Jens-Max; Heinze, Hans-Jochen; Woldorff, Marty G
2016-08-15
Reward-associated visual features have been shown to capture visual attention, evidenced in faster and more accurate behavioral performance, as well as in neural responses reflecting lateralized shifts of visual attention to those features. Specifically, the contralateral N2pc event-related-potential (ERP) component that reflects attentional shifting exhibits increased amplitude in response to task-relevant targets containing a reward-associated feature. In the present study, we examined the automaticity of such reward-association effects using object-substitution masking (OSM) in conjunction with MEG measures of visual attentional shifts. In OSM, a visual-search array is presented, with the target item to be detected indicated by a surrounding mask (here, four surrounding squares). Delaying the offset of the target-surrounding four-dot mask relative to the offset of the rest of the target/distracter array disrupts the viewer's awareness of the target (masked condition), whereas simultaneous offsets do not (unmasked condition). Here we manipulated whether the color of the OSM target was or was not of a previously reward-associated color. By tracking reward-associated enhancements of behavior and the N2pc in response to masked targets containing a previously rewarded or unrewarded feature, the automaticity of attentional capture by reward could be probed. We found an enhanced N2pc response to targets containing a previously reward-associated color feature. Moreover, this enhancement of the N2pc by reward did not differ between masking conditions, nor did it differ as a function of the apparent visibility of the target within the masked condition. Overall, these results underscore the automaticity of attentional capture by reward-associated features, and demonstrate the ability of feature-based reward associations to shape attentional capture and allocation outside of perceptual awareness. Copyright © 2016 Elsevier Inc. All rights reserved.
The Four-Quadrant Phase-Mask Coronagraph. II. Simulations
NASA Astrophysics Data System (ADS)
Riaud, P.; Boccaletti, A.; Rouan, D.; Lemarquis, F.; Labeyrie, A.
2001-09-01
In the first paper in this series, we described the principle of a coronagraph utilizing a four-quadrant phase mask and the results of numerical simulations obtained in the perfect case. In this second paper, we performed additional numerical simulations to assess in more detail the performances and limitations of this coronagraph under real conditions. The effect of geometrical parameters such as shape and size of both the phase mask and the Lyot stop is studied. We also analyze the effect of low- and high-order aberrations generated, for instance, by the atmospheric turbulence. An important issue is the wavelength dependence of the phase mask. We show that the performance decreases rapidly as the spectral bandwidth is increased, and as a consequence, we discuss the manufacturing of achromatized masks using multiple thin films. An optical concept is proposed.
Single-longitudinal mode distributed-feedback fiber laser with low-threshold and high-efficiency
NASA Astrophysics Data System (ADS)
Jiang, Man; Zhou, Pu; Gu, Xijia
2018-01-01
Single-frequency fiber laser has attracted a lot of interest in recent years due to its numerous application potentials in telecommunications, LIDAR, high resolution sensing, atom frequency standard, etc. Phosphate glass fiber is one of the candidates for building compact high gain fiber lasers because of its capability of high-concentration of rare-earth ions doping in fiber core. Nevertheless, it is challenging for the integration of UV-written intra-core fiber Bragg gratings into the fiber laser cavity due to the low photosensitivity of phosphate glass fiber. The research presented in this paper will focus on demonstration of UV-written Bragg gratings in phosphate glass fiber and its application in direct-written short monolithic single-frequency fiber lasers. Strong π-phase shift Bragg grating structure is direct-inscribed into the Er/Yb co-doped gain fiber using an excimer laser, and a 5-cm-long phase mask is used to inscribe a laser cavity into the Er/Yb co-doped phosphate glass fibers. The phase mask is a uniform mask with a 50 μm gap in the middle. The fiber laser device emits output power of 10.44 mW with a slope efficiency of 21.5% and the threshold power is about 42.8 mW. Single-longitudinal mode operation is validated by radio frequency spectrum measurement. Moreover, the output spectrum at the highest power shows an excellent optical signal to noise ratio of about 70 dB. These results, to the best of our knowledge, show the lowest power threshold and highest efficiency among the reports that using the same structure to achieve single-longitudinal mode laser output.
Vectorial mask optimization methods for robust optical lithography
NASA Astrophysics Data System (ADS)
Ma, Xu; Li, Yanqiu; Guo, Xuejia; Dong, Lisong; Arce, Gonzalo R.
2012-10-01
Continuous shrinkage of critical dimension in an integrated circuit impels the development of resolution enhancement techniques for low k1 lithography. Recently, several pixelated optical proximity correction (OPC) and phase-shifting mask (PSM) approaches were developed under scalar imaging models to account for the process variations. However, the lithography systems with larger-NA (NA>0.6) are predominant for current technology nodes, rendering the scalar models inadequate to describe the vector nature of the electromagnetic field that propagates through the optical lithography system. In addition, OPC and PSM algorithms based on scalar models can compensate for wavefront aberrations, but are incapable of mitigating polarization aberrations in practical lithography systems, which can only be dealt with under the vector model. To this end, we focus on developing robust pixelated gradient-based OPC and PSM optimization algorithms aimed at canceling defocus, dose variation, wavefront and polarization aberrations under a vector model. First, an integrative and analytic vector imaging model is applied to formulate the optimization problem, where the effects of process variations are explicitly incorporated in the optimization framework. A steepest descent algorithm is then used to iteratively optimize the mask patterns. Simulations show that the proposed algorithms can effectively improve the process windows of the optical lithography systems.
Polarization-based compensation of astigmatism.
Chowdhury, Dola Roy; Bhattacharya, Kallol; Chakraborty, Ajay K; Ghosh, Raja
2004-02-01
One approach to aberration compensation of an imaging system is to introduce a suitable phase mask at the aperture plane of an imaging system. We utilize this principle for the compensation of astigmatism. A suitable polarization mask used on the aperture plane together with a polarizer-retarder combination at the input of the imaging system provides the compensating polarization-induced phase steps at different quadrants of the apertures masked by different polarizers. The aberrant phase can be considerably compensated by the proper choice of a polarization mask and suitable selection of the polarization parameters involved. The results presented here bear out our theoretical expectation.
Laboratory demonstration of an optical vortex mask coronagraph using photonic crystal
NASA Astrophysics Data System (ADS)
Murakami, N.; Baba, N.; Ise, A.; Sakamoto, M.; Oka, K.
2010-10-01
Photonic crystal, artificial periodic nanostructure, is an attractive device for constructing focal-plane phase-mask coronagraphs such as segmented phase masks (four-quadrant, eight-octant, and 4N-segmented ones) and an optical vortex mask (OVM), because of its extremely small manufacturing defect. Recently, speckle-noise limited contrast has been demonstrated for two monochromatic lasers by using the eight-octant phase-mask made of the photonic crystal (Murakami et al. 2010, ApJ, 714, 772). We applied the photonic-crystal device to the OVM coronagraph. The OVM is more advantageous over the segmented phase masks because it does not have discontinuities other than a central singular point and provides a full on-sky field of view. For generating an achromatic optical vortex, we manufactured an axially-symmetric half-wave plate (ASHWP). It is expected that a size of the manufacturing defect due to the central singularity is an order of several hundreds nanometers. The ASHWP is placed between two circular polarizers for modulating a Pancharatnam phase. A continuous spiral phase modulation is then implemented achromatically. We carried out preliminary laboratory demonstration of the OVM coronagraph using two monochromatic lasers as a model star (wavelengths of 532 nm and 633 nm). We report a principle of the achromatic optical-vortex generation, and results of the laboratory demonstration of the OVM coronagraph.
Accounting for phase drifts in SSVEP-based BCIs by means of biphasic stimulation.
Wu, Hung-Yi; Lee, Po-Lei; Chang, Hsiang-Chih; Hsieh, Jen-Chuen
2011-05-01
This study proposes a novel biphasic stimulation technique to solve the issue of phase drifts in steady-state visual evoked potential (SSVEPs) in phase-tagged systems. Phase calibration was embedded in stimulus sequences using a biphasic flicker, which is driven by a sequence with alternating reference and phase-shift states. Nine subjects were recruited to participate in off-line and online tests. Signals were bandpass filtered and segmented by trigger signals into reference and phase-shift epochs. Frequency components of SSVEP in the reference and phase-shift epochs were extracted using the Fourier method with a 50% overlapped sliding window. The real and imaginary parts of the SSVEP frequency components were organized into complex vectors in each epoch. Hotelling's t-square test was used to determine the significances of nonzero mean vectors. The rejection of noisy data segments and the validation of gaze detections were made based on p values. The phase difference between the valid mean vectors of reference and phase-shift epochs was used to identify user's gazed targets in this system. Data showed an average information transfer rate of 44.55 and 38.21 bits/min in off-line and online tests, respectively. © 2011 IEEE
Fabrication et applications des reseaux de Bragg ultra-longs
NASA Astrophysics Data System (ADS)
Gagne, Mathieu
This thesis presents the principal accomplishments realized during the PhD project. The thesis is presented by publication format and is a collection of four published articles having fiber Bragg gratings as a central theme. First achieved in 1978, UV writing of fiber Bragg gratings is nowadays a common and mature technology being present in both industry and academia. The property of reflecting light guided by optical fibers lead to diverse applications in telecommunication, lasers as well as several types of sensors. The conventional fabrication technique is generally based on the use of generally expensive phase masks which determine the obtained characteristics of the fiber Bragg grating. The fiber being photosensitive at those wavelengths, a periodic pattern can be written into it. The maximal length, the period, the chirp, the index contrast and the apodisation are all characteristics that depend on the phase mask. The first objective of the research project is to be able to go beyond this strong dependance on the phase mask without deteriorating grating quality. This is what really sets apart the technique presented in this thesis from other long fiber Bragg grating fabrication techniques available in the literature. The fundamental approach to obtain ultra long fiber Bragg gratings of arbitrary profile is to replace the scheme of scanning a UV beam across a phase mask to expose a fixed fiber by a scheme where the UV beam and phase mask are fixed and where the fiber is moving instead. To obtain a periodic index variation, the interference pattern itself must be synchronized with the moving fiber. Two variations of this scheme were implanted: the first one using electro-optical phase modulator placed in each arm of a Talbot interferometer and the second one using a phase mask mounted on a piezo electric actuator. A new scheme that imparts fine movements of the interferometer is also implemented for the first time and showed to be essential to achieve high quality ultra long fiber Bragg gratings. High quality theory matching ultra long fiber Bragg gratings up to 1 meter long are obtained for the first time. The possibility of fabricating high quality ultra long fiber Bragg grating of more than 10 cm (approximately the maximal phase mask length) opens a variety of new applications otherwise impossible with short fiber Bragg grating technology. Ultra long fiber Bragg gratings have unique characteristics such as high reflectivity, high dispersion and ultra narrow bandwidth. Those characteristics can be used to do advanced signal processing, non linear propagation experiments, distributed feedback fiber lasers and dispersion compensator for telecommunication or optical tomography. The second objective of this project is to use these ultra-long fiber Bragg gratings as an optical cavity for fiber lasers. Alot of research in the past years have been concentrated on those lasers, particularly on distributed feedback fiber lasers where the gratings spans all the gain media. A new random fiber laser configuration is presented. It is based on passive or active insertion of phase shifts along the Bragg grating to obtained a phenomenon called light localization which is the optical equivalent of Anderson localization. This complex wave phenomenon has the unique property to mimic the reflection of a uniform photonic crystal with the random diffusion of light among the elements of a random media. Being commonly obtained in fine powders which must respect a certain set of rules, the realization of 1D structures is vastly simplified in optical fibers. Two random fiber laser schemes based on light localization, one using erbium dopant and the other one Raman scattering, are demonstrated for the first time and compared to traditional distributed feedback fiber lasers.
The flash memory battle: How low can we go?
NASA Astrophysics Data System (ADS)
van Setten, Eelco; Wismans, Onno; Grim, Kees; Finders, Jo; Dusa, Mircea; Birkner, Robert; Richter, Rigo; Scherübl, Thomas
2008-03-01
With the introduction of the TWINSCAN XT:1900Gi the limit of the water based hyper-NA immersion lithography has been reached in terms of resolution. With a numerical aperture of 1.35 a single expose resolution of 36.5nm half pitch has been demonstrated. However the practical resolution limit in production will be closer to 40nm half pitch, without having to go to double patterning alike strategies. In the relentless Flash memory market the performance of the exposure tool is stretched to the limit for a competitive advantage and cost-effective product. In this paper we will present the results of an experimental study of the resolution limit of the NAND-Flash Memory Gate layer for a production-worthy process on the TWINSCAN XT:1900Gi. The entire gate layer will be qualified in terms of full wafer CD uniformity, aberration sensitivities for the different wordlines and feature-center placement errors for 38, 39, 40 and 43nm half pitch design rule. In this study we will also compare the performance of a binary intensity mask to a 6% attenuated phase shift mask and look at strategies to maximize Depth of Focus, and to desensitize the gate layer for lens aberrations and placement errors. The mask is one of the dominant contributors to the CD uniformity budget of the flash gate layer. Therefore the wafer measurements are compared to aerial image measurements of the mask using AIMSTM 45-193i to separate the mask contribution from the scanner contribution to the final imaging performance.
Jing, Wencai; Zhang, Yimo; Zhou, Ge
2002-07-15
A new structure for bit synchronization in a tera-bit/s optical interconnection network has been designed using micro-electro-mechanical system (MEMS) technique. Link multiplexing has been adopted to reduce data packet communication latency. To eliminate link set-up time, adjustable optical delay lines (AODLs) have been adopted to shift the phases of the distributed optical clock signals for bit synchronization. By changing the optical path distance of the optical clock signal, the phase of the clock signal can be shifted at a very high resolution. A phase-shift resolution of 0.1 ps can be easily achieved with 30-microm alternation of the optical path length in vacuum.
NASA Astrophysics Data System (ADS)
King, Sharon V.; Doblas, Ana; Patwary, Nurmohammed; Saavedra, Genaro; Martínez-Corral, Manuel; Preza, Chrysanthe
2014-03-01
Wavefront coding techniques are currently used to engineer unique point spread functions (PSFs) that enhance existing microscope modalities or create new ones. Previous work in this field demonstrated that simulated intensity PSFs encoded with a generalized cubic phase mask (GCPM) are invariant to spherical aberration or misfocus; dependent on parameter selection. Additional work demonstrated that simulated PSFs encoded with a squared cubic phase mask (SQUBIC) produce a depth invariant focal spot for application in confocal scanning microscopy. Implementation of PSF engineering theory with a liquid crystal on silicon (LCoS) spatial light modulator (SLM) enables validation of WFC phase mask designs and parameters by manipulating optical wavefront properties with a programmable diffractive element. To validate and investigate parameters of the GCPM and SQUBIC WFC masks, we implemented PSF engineering in an upright microscope modified with a dual camera port and a LCoS SLM. We present measured WFC PSFs and compare them to simulated PSFs through analysis of their effect on the microscope imaging system properties. Experimentally acquired PSFs show the same intensity distribution as simulation for the GCPM phase mask, the SQUBIC-mask and the well-known and characterized cubic-phase mask (CPM), first applied to high NA microscopy by Arnison et al.10, for extending depth of field. These measurements provide experimental validation of new WFC masks and demonstrate the use of the LCoS SLM as a WFC design tool. Although efficiency improvements are needed, this application of LCoS technology renders the microscope capable of switching among multiple WFC modes.
Optimization technique of wavefront coding system based on ZEMAX externally compiled programs
NASA Astrophysics Data System (ADS)
Han, Libo; Dong, Liquan; Liu, Ming; Zhao, Yuejin; Liu, Xiaohua
2016-10-01
Wavefront coding technique as a means of athermalization applied to infrared imaging system, the design of phase plate is the key to system performance. This paper apply the externally compiled programs of ZEMAX to the optimization of phase mask in the normal optical design process, namely defining the evaluation function of wavefront coding system based on the consistency of modulation transfer function (MTF) and improving the speed of optimization by means of the introduction of the mathematical software. User write an external program which computes the evaluation function on account of the powerful computing feature of the mathematical software in order to find the optimal parameters of phase mask, and accelerate convergence through generic algorithm (GA), then use dynamic data exchange (DDE) interface between ZEMAX and mathematical software to realize high-speed data exchanging. The optimization of the rotational symmetric phase mask and the cubic phase mask have been completed by this method, the depth of focus increases nearly 3 times by inserting the rotational symmetric phase mask, while the other system with cubic phase mask can be increased to 10 times, the consistency of MTF decrease obviously, the maximum operating temperature of optimized system range between -40°-60°. Results show that this optimization method can be more convenient to define some unconventional optimization goals and fleetly to optimize optical system with special properties due to its externally compiled function and DDE, there will be greater significance for the optimization of unconventional optical system.
Figueiro, Mariana G; Plitnick, Barbara; Rea, Mark S
2014-01-01
Circadian rhythm disturbances parallel the increased prevalence of sleep disorders in older adults. Light therapies that specifically target regulation of the circadian system in principle could be used to treat sleep disorders in this population. Current recommendations for light treatment require the patients to sit in front of a bright light box for at least 1 hour daily, perhaps limiting their willingness to comply. Light applied through closed eyelids during sleep might not only be efficacious for changing circadian phase but also lead to better compliance because patients would receive light treatment while sleeping. Reported here are the results of two studies investigating the impact of a train of 480 nm (blue) light pulses presented to the retina through closed eyelids on melatonin suppression (laboratory study) and on delaying circadian phase (field study). Both studies employed a sleep mask that provided narrowband blue light pulses of 2-second duration every 30 seconds from arrays of light-emitting diodes. The results of the laboratory study demonstrated that the blue light pulses significantly suppressed melatonin by an amount similar to that previously shown in the same protocol at half the frequency (ie, one 2-second pulse every minute for 1 hour). The results of the field study demonstrated that blue light pulses given early in the sleep episode significantly delayed circadian phase in older adults; these results are the first to demonstrate the efficacy and practicality of light treatment by a sleep mask aimed at adjusting circadian phase in a home setting.
Earth Tide Analysis Specifics in Case of Unstable Aquifer Regime
NASA Astrophysics Data System (ADS)
Vinogradov, Evgeny; Gorbunova, Ella; Besedina, Alina; Kabychenko, Nikolay
2017-06-01
We consider the main factors that affect underground water flow including aquifer supply, collector state, and distant earthquakes seismic waves' passage. In geodynamically stable conditions underground inflow change can significantly distort hydrogeological response to Earth tides, which leads to the incorrect estimation of phase shift between tidal harmonics of ground displacement and water level variations in a wellbore. Besides an original approach to phase shift estimation that allows us to get one value per day for the semidiurnal M2 wave, we offer the empirical method of excluding periods of time that are strongly affected by high inflow. In spite of rather strong ground motion during earthquake waves' passage, we did not observe corresponding phase shift change against the background on significant recurrent variations due to fluctuating inflow influence. Though inflow variations do not look like the only important parameter that must be taken into consideration while performing phase shift analysis, permeability estimation is not adequate without correction based on background alternations of aquifer parameters due to natural and anthropogenic reasons.
Earth Tide Analysis Specifics in Case of Unstable Aquifer Regime
NASA Astrophysics Data System (ADS)
Vinogradov, Evgeny; Gorbunova, Ella; Besedina, Alina; Kabychenko, Nikolay
2018-05-01
We consider the main factors that affect underground water flow including aquifer supply, collector state, and distant earthquakes seismic waves' passage. In geodynamically stable conditions underground inflow change can significantly distort hydrogeological response to Earth tides, which leads to the incorrect estimation of phase shift between tidal harmonics of ground displacement and water level variations in a wellbore. Besides an original approach to phase shift estimation that allows us to get one value per day for the semidiurnal M2 wave, we offer the empirical method of excluding periods of time that are strongly affected by high inflow. In spite of rather strong ground motion during earthquake waves' passage, we did not observe corresponding phase shift change against the background on significant recurrent variations due to fluctuating inflow influence. Though inflow variations do not look like the only important parameter that must be taken into consideration while performing phase shift analysis, permeability estimation is not adequate without correction based on background alternations of aquifer parameters due to natural and anthropogenic reasons.
Testing the efficacy of homemade masks: would they protect in an influenza pandemic?
Davies, Anna; Thompson, Katy-Anne; Giri, Karthika; Kafatos, George; Walker, Jimmy; Bennett, Allan
2013-08-01
This study examined homemade masks as an alternative to commercial face masks. Several household materials were evaluated for the capacity to block bacterial and viral aerosols. Twenty-one healthy volunteers made their own face masks from cotton t-shirts; the masks were then tested for fit. The number of microorganisms isolated from coughs of healthy volunteers wearing their homemade mask, a surgical mask, or no mask was compared using several air-sampling techniques. The median-fit factor of the homemade masks was one-half that of the surgical masks. Both masks significantly reduced the number of microorganisms expelled by volunteers, although the surgical mask was 3 times more effective in blocking transmission than the homemade mask. Our findings suggest that a homemade mask should only be considered as a last resort to prevent droplet transmission from infected individuals, but it would be better than no protection.
NASA Astrophysics Data System (ADS)
Lang, Jun; Zhang, Jing
2015-03-01
In our proposed optical image cryptosystem, two pairs of phase-amplitude masks are generated from the chaotic web map for image encryption in the 4f double random phase-amplitude encoding (DRPAE) system. Instead of transmitting the real keys and the enormous masks codes, only a few observed measurements intermittently chosen from the masks are delivered. Based on compressive sensing paradigm, we suitably refine the series expansions of web map equations to better reconstruct the underlying system. The parameters of the chaotic equations can be successfully calculated from observed measurements and then can be used to regenerate the correct random phase-amplitude masks for decrypting the encoded information. Numerical simulations have been performed to verify the proposed optical image cryptosystem. This cryptosystem can provide a new key management and distribution method. It has the advantages of sufficiently low occupation of the transmitted key codes and security improvement of information transmission without sending the real keys.
Del Re, Elisabetta C; Gao, Yi; Eckbo, Ryan; Petryshen, Tracey L; Blokland, Gabriëlla A M; Seidman, Larry J; Konishi, Jun; Goldstein, Jill M; McCarley, Robert W; Shenton, Martha E; Bouix, Sylvain
2016-01-01
Brain masking of MRI images separates brain from surrounding tissue and its accuracy is important for further imaging analyses. We implemented a new brain masking technique based on multi-atlas brain segmentation (MABS) and compared MABS to masks generated using FreeSurfer (FS; version 5.3), Brain Extraction Tool (BET), and Brainwash, using manually defined masks (MM) as the gold standard. We further determined the effect of different masking techniques on cortical and subcortical volumes generated by FreeSurfer. Images were acquired on a 3-Tesla MR Echospeed system General Electric scanner on five control and five schizophrenia subjects matched on age, sex, and IQ. Automated masks were generated from MABS, FS, BET, and Brainwash, and compared to MM using these metrics: a) volume difference from MM; b) Dice coefficients; and c) intraclass correlation coefficients. Mean volume difference between MM and MABS masks was significantly less than the difference between MM and FS or BET masks. Dice coefficient between MM and MABS was significantly higher than Dice coefficients between MM and FS, BET, or Brainwash. For subcortical and left cortical regions, MABS volumes were closer to MM volumes than were BET or FS volumes. For right cortical regions, MABS volumes were closer to MM volumes than were BET volumes. Brain masks generated using FreeSurfer, BET, and Brainwash are rapidly obtained, but are less accurate than manually defined masks. Masks generated using MABS, in contrast, resemble more closely the gold standard of manual masking, thereby offering a rapid and viable alternative. Copyright © 2015 by the American Society of Neuroimaging.
Cross-orientation suppression in human visual cortex
Heeger, David J.
2011-01-01
Cross-orientation suppression was measured in human primary visual cortex (V1) to test the normalization model. Subjects viewed vertical target gratings (of varying contrasts) with or without a superimposed horizontal mask grating (fixed contrast). We used functional magnetic resonance imaging (fMRI) to measure the activity in each of several hypothetical channels (corresponding to subpopulations of neurons) with different orientation tunings and fit these orientation-selective responses with the normalization model. For the V1 channel maximally tuned to the target orientation, responses increased with target contrast but were suppressed when the horizontal mask was added, evident as a shift in the contrast gain of this channel's responses. For the channel maximally tuned to the mask orientation, a constant baseline response was evoked for all target contrasts when the mask was absent; responses decreased with increasing target contrast when the mask was present. The normalization model provided a good fit to the contrast-response functions with and without the mask. In a control experiment, the target and mask presentations were temporally interleaved, and we found no shift in contrast gain, i.e., no evidence for suppression. We conclude that the normalization model can explain cross-orientation suppression in human visual cortex. The approach adopted here can be applied broadly to infer, simultaneously, the responses of several subpopulations of neurons in the human brain that span particular stimulus or feature spaces, and characterize their interactions. In addition, it allows us to investigate how stimuli are represented by the inferred activity of entire neural populations. PMID:21775720
Evaluation of Occupational Exposure of Glazers of a Ceramic Industry to Cobalt Blue Dye
KARGAR, Fatemeh; SHAHTAHERI, Seyed Jamaleddin; GOLBABAEI, Farideh; BARKHORDARI, Abolfazl; RAHIMI-FROUSHANI, Abbas; KHADEM, Monireh
2013-01-01
Background: Cobalt is one of the most important constituent present in ceramic industries. Glazers are the relevant workers when they are producing blue colored ceramic, causing occupational exposure to such metal. Through this study, urinary cobalt was determined in glazers in a ceramic industry when they were producing blue-colored ceramic glazes. Methods: In this case-control study, spot urine samples were collected from 49 glazers at the start and end of work shifts (totally 98 samples) in 2011. Control group were well matched for age, height, and weight. A solid phase extraction system was used for separation and preconcentration of samples followed by analysis by inductively coupled plasma-atomic emission spectroscopy (ICP-AES). All participants filled out a self administered questionnaire comprises questions about duration of exposure, work shift, use of mask, skin dermatitis, kind of job, ventilation system, overtime work, age, weight, and height. The lung function tests were performed on each control and cobalt exposed subjects. Analysis of covariance (ANCOVA) was used to evaluate the obtained results. Results: Urinary levels of cobalt were significantly higher in the glazers compared to the control group. There were significant differences at urinary concentration of cobalt at the start and end of the work shift in glazers. Spirometric parameters were significantly lower in the glazers compared to the control group. Among the variables used in questionnaire the significant variables were dermatitis skin, mask, ventilation, and overtime work. Conclusion: This study verified existence of cobalt in the urine glazers, showing lower amount than the ACGIH standard. PMID:26056641
Hasselmo, Michael E.
2008-01-01
This article presents a model of grid cell firing based on the intrinsic persistent firing shown experimentally in neurons of entorhinal cortex. In this model, the mechanism of persistent firing allows individual neurons to hold a stable baseline firing frequency. Depolarizing input from speed modulated head direction cells transiently shifts the frequency of firing from baseline, resulting in a shift in spiking phase in proportion to the integral of velocity. The convergence of input from different persistent firing neurons causes spiking in a grid cell only when the persistent firing neurons are within similar phase ranges. This model effectively simulates the two-dimensional firing of grid cells in open field environments, as well as the properties of theta phase precession. This model provides an alternate implementation of oscillatory interference models. The persistent firing could also interact on a circuit level with rhythmic inhibition and neurons showing membrane potential oscillations to code position with spiking phase. These mechanisms could operate in parallel with computation of position from visual angle and distance of stimuli. In addition to simulating two-dimensional grid patterns, models of phase interference can account for context-dependent firing in other tasks. In network simulations of entorhinal cortex, hippocampus and postsubiculum, the reset of phase effectively replicates context-dependent firing by entorhinal and hippocampal neurons during performance of a continuous spatial alternation task, a delayed spatial alternation task with running in a wheel during the delay period, and a hairpin maze task. PMID:19021258
Single closed contact for 0.18-micron photolithography process
NASA Astrophysics Data System (ADS)
Cheung, Cristina; Phan, Khoi A.; Chiu, Robert J.
2000-06-01
With the rapid advances of deep submicron semiconductor technology, identifying defects is converted into a challenge for different modules in the fabrication of chips. Yield engineers often do bitmap on a memory circuit array (SRAM) to identify the failure bits. This is followed by a wafer stripback to look for visual defects at each deprocessed layer for feedback to the Fab. However, to identify the root cause of a problem, Fab engineers must be able to detect similar defects either on the product wafers in process or some short loop test wafers. In the photolithography process, we recognize that the detection of defects is becoming as important as satisfying the critical dimension (CD) of the device. For a multi-level metallization chemically mechanical polish backend process, it is very difficult to detect missing contacts or via at the masking steps due to metal grain roughness, film color variation and/or previous layer defects. Often, photolithography engineer must depend on Photo Cell Monitor (PCM) and short loop experiments for controlling baseline defects and improvement. In this paper, we discuss the findings on the Poly mask PCM and the Contact mask PCM. We present the comparison between the Poly mask and the Contact mask of the I-line Phase Shifted Via mask and DUV mask process for a 0.18 micron process technology. The correlation and the different type of defects between the Contact PCM and the Poly Mask are discussed. The Contact PCM was found to be more sensitive and correlated to contact failure at sort yield better. We also dedicate to study the root cause of a single closed contact hole in the Contact mask short loop experiment for a 0.18 micron process technology. A single closed contact defect was often caused by the developer process, such as bubbles in the line, resist residue left behind, and the rinse mechanism. We also found surfactant solution helps to improve the surface tension of the wafer for the developer process and this prevents/eliminates a single closed contact hole defects. The applications and effects of using different substrates like SiON, different thicknesses of Oxides, and Poly in the Contact Photo Mask is shown. Finally, some defect troubleshooting techniques and the root cause analysis are also discussed.
Comprehensive phase diagram of two-dimensional space charge doped Bi2Sr2CaCu2O8+x.
Sterpetti, Edoardo; Biscaras, Johan; Erb, Andreas; Shukla, Abhay
2017-12-12
The phase diagram of hole-doped high critical temperature superconductors as a function of doping and temperature has been intensively studied with chemical variation of doping. Chemical doping can provoke structural changes and disorder, masking intrinsic effects. Alternatively, a field-effect transistor geometry with an electrostatically doped, ultra-thin sample can be used. However, to probe the phase diagram, carrier density modulation beyond 10 14 cm -2 and transport measurements performed over a large temperature range are needed. Here we use the space charge doping method to measure transport characteristics from 330 K to low temperature. We extract parameters and characteristic temperatures over a large doping range and establish a comprehensive phase diagram for one-unit-cell-thick BSCCO-2212 as a function of doping, temperature and disorder.
NOTE ON TRAVEL TIME SHIFTS DUE TO AMPLITUDE MODULATION IN TIME-DISTANCE HELIOSEISMOLOGY MEASUREMENTS
DOE Office of Scientific and Technical Information (OSTI.GOV)
Nigam, R.; Kosovichev, A. G., E-mail: rakesh@quake.stanford.ed, E-mail: sasha@quake.stanford.ed
Correct interpretation of acoustic travel times measured by time-distance helioseismology is essential to get an accurate understanding of the solar properties that are inferred from them. It has long been observed that sunspots suppress p-mode amplitude, but its implications on travel times have not been fully investigated so far. It has been found in test measurements using a 'masking' procedure, in which the solar Doppler signal in a localized quiet region of the Sun is artificially suppressed by a spatial function, and using numerical simulations that the amplitude modulations in combination with the phase-speed filtering may cause systematic shifts ofmore » acoustic travel times. To understand the properties of this procedure, we derive an analytical expression for the cross-covariance of a signal that has been modulated locally by a spatial function that has azimuthal symmetry and then filtered by a phase-speed filter typically used in time-distance helioseismology. Comparing this expression to the Gabor wavelet fitting formula without this effect, we find that there is a shift in the travel times that is introduced by the amplitude modulation. The analytical model presented in this paper can be useful also for interpretation of travel time measurements for the non-uniform distribution of oscillation amplitude due to observational effects.« less
NASA Astrophysics Data System (ADS)
Lee, Kyung M.; Yedur, Sanjay; Henrichs, Sven; Tavassoli, Malahat; Baik, Kiho
2007-03-01
Evaluation of lithography process or stepper involves very large quantity of CD measurements and measurement time. In this paper, we report on a application of Scatterometry based metrology for evaluation of binary photomask lithography. Measurements were made on mask level with ODP scatterometer then on wafer with CD-SEM. 4 to 1 scaling from mask to wafer means 60nm line on wafer translates to 240nm on mask, easily measurable on ODP. Calculation of scatterometer profile information was performed by a in-situ library-based analysis (5sec/site). We characterized the CD uniformity, linearity, and metal film thickness uniformity. Results show that linearity measured from fixed-pitch, varying line/space ratio targets show good correlation to top-down CD-SEM with R2 of more than 0.99. ODP-SEM correlation results for variable pitch shows that careful examination of scatterometer profile results in order to obtain better correlation to CD SEM, since both tools react differently to the target profile variation. ODP results show that global CD distribution is clearly measurable with less outliers compared to CD SEM data. This is thought to be due to 'averaging' effect of scatterometer. The data show that Scatterometry provides a nondestructive and faster mean of characterizing lithography stepper performanceprofiles. APSM 1st level (before Cr removal) 'dual-space' CDs and EPSM rectangular contacts were also measured with and results demonstrates that Scatterometer is capable of measuring these targets with reasonable correlation to SEM.
Masking with faces in central visual field under a variety of temporal schedules.
Daar, Marwan; Wilson, Hugh R
2015-11-01
With a few exceptions, previous studies have explored masking using either a backward mask or a common onset trailing mask, but not both. In a series of experiments, we demonstrate the use of faces in central visual field as a viable method to study the relationship between these two types of mask schedule. We tested observers in a two alternative forced choice face identification task, where both target and mask comprised synthetic faces, and show that a simple model can successfully predict masking across a variety of masking schedules ranging from a backward mask to a common onset trailing mask and a number of intermediate variations. Our data are well accounted for by a window of sensitivity to mask interference that is centered at around 100 ms. Copyright © 2015 Elsevier Ltd. All rights reserved.
Requirements and Design Reference Mission for the WFIRST-AFTA Coronagraph Instrument
NASA Technical Reports Server (NTRS)
Demers, Richard T.; Dekens, Frank; Calvet, Rob; Chang, Zensheu; Effinger, Robert; Ek, Eric; Hovland, Larry; Jones, Laura; Loc, Anthony; Nemati, Bijan;
2015-01-01
The WFIRST-AFTA coronagraph instrument take s advantage of AFTA s 2.4 -meter aperture to provide novel exoplanet imaging science at approximately the same instrument cost as an Explorer mission. The AFTA coronagraph also matures direct imaging technologies to high TRL for an Exo-Earth Imager in the next decade. The coronagraph Design Reference Mission (DRM) optical design is based on the highly successful High Contrast Imaging Testbed (HCIT), with modifications to accommodate the AFTA telescope design, service-ability, volume constraints, and the addition of an Integral Field Spectrograph (IFS). In order to optimally satisfy the three science objectives of planet imaging, planet spectral characterization and dust debris imaging, the coronagraph is designed to operate in two different modes : Hybrid Lyot Coronagraph or Shaped Pupil Coronagraph. Active mechanisms change pupil masks, focal plane masks, yot masks, and bandpass filters to shift between modes. A single optical beam train can thus operate alternatively as two different coronagraph architecture s. Structural Thermal Optical Performance (STOP) analysis predict s the instrument contrast with the Low Order Wave Front Control loop closed. The STOP analysis was also used to verify that the optical/structural/thermal design provides the extreme stability required for planet characterization in the presence of thermal disturbances expected in a typical observing scenario. This paper describes the instrument design and the flow down from science requirements to high level engineering requirements.
Adaptation to Experimental Jet-Lag in R6/2 Mice despite Circadian Dysrhythmia
Wood, Nigel I.; McAllister, Catherine J.; Cuesta, Marc; Aungier, Juliet; Fraenkel, Eloise; Morton, A. Jennifer
2013-01-01
The R6/2 transgenic mouse model of Huntington’s disease (HD) shows a disintegration of circadian rhythms that can be delayed by pharmacological and non-pharmacological means. Since the molecular machinery underlying the circadian clocks is intact, albeit progressively dysfunctional, we wondered if light phase shifts could modulate the deterioration in daily rhythms in R6/2 mice. Mice were subjected to four x 4 hour advances in light onset. R6/2 mice adapted to phase advances, although angles of entrainment increased with age. A second cohort was subjected to a jet-lag paradigm (6 hour delay or advance in light onset, then reversal after 2 weeks). R6/2 mice adapted to the original shift, but could not adjust accurately to the reversal. Interestingly, phase shifts ameliorated the circadian rhythm breakdown seen in R6/2 mice under normal LD conditions. Our previous finding that the circadian period (tau) of 16 week old R6/2 mice shortens to approximately 23 hours may explain how they adapt to phase advances and maintain regular circadian rhythms. We tested this using a 23 hour period light/dark cycle. R6/2 mice entrained to this cycle, but onsets of activity continued to advance, and circadian rhythms still disintegrated. Therefore, the beneficial effects of phase-shifting are not due solely to the light cycle being closer to the tau of the mice. Our data show that R6/2 mice can adapt to changes in the LD schedule, even beyond the age when their circadian rhythms would normally disintegrate. Nevertheless, they show abnormal responses to changes in light cycles. These might be caused by a shortened tau, impaired photic re-synchronization, impaired light detection and/or reduced masking by evening light. If similar abnormalities are present in HD patients, they may suffer exaggerated jet-lag. Since the underlying molecular clock mechanism remains intact, light may be a useful treatment for circadian dysfunction in HD. PMID:23390510
DOE Office of Scientific and Technical Information (OSTI.GOV)
Abdullina, S R; Nemov, I N; Babin, Sergei A
2012-09-30
The possibility of apodisation of fibre Bragg gratings (FBGs) recorded in the interference region of two Gaussian beams in the phase-mask scheme is considered. The FBG reflection spectra are numerically simulated for different values of recordingbeam parameters and the distance between the axes of interfering beams diffracted into different orders, which is varied by transverse displacement of the phase mask with respect to the optical fibre. Suppression of side lobes and smoothing out of the FBG spectrum with an increase in the transverse displacement of the phase mask is experimentally demonstrated. It is shown that this effect is caused bymore » the equalisation of the mean induced refractive index in the FBG region. (optical fibres, lasers and amplifiers. properties and applications)« less
NASA Astrophysics Data System (ADS)
Mita, Akifumi; Okamoto, Atsushi; Funakoshi, Hisatoshi
2004-06-01
We have proposed an all-optical authentic memory with the two-wave encryption method. In the recording process, the image data are encrypted to a white noise by the random phase masks added on the input beam with the image data and the reference beam. Only reading beam with the phase-conjugated distribution of the reference beam can decrypt the encrypted data. If the encrypted data are read out with an incorrect phase distribution, the output data are transformed into a white noise. Moreover, during read out, reconstructions of the encrypted data interfere destructively resulting in zero intensity. Therefore our memory has a merit that we can detect unlawful accesses easily by measuring the output beam intensity. In our encryption method, the random phase mask on the input plane plays important roles in transforming the input image into a white noise and prohibiting to decrypt a white noise to the input image by the blind deconvolution method. Without this mask, when unauthorized users observe the output beam by using CCD in the readout with the plane wave, the completely same intensity distribution as that of Fourier transform of the input image is obtained. Therefore the encrypted image will be decrypted easily by using the blind deconvolution method. However in using this mask, even if unauthorized users observe the output beam using the same method, the encrypted image cannot be decrypted because the observed intensity distribution is dispersed at random by this mask. Thus it can be said the robustness is increased by this mask. In this report, we compare two correlation coefficients, which represents the degree of a white noise of the output image, between the output image and the input image in using this mask or not. We show that the robustness of this encryption method is increased as the correlation coefficient is improved from 0.3 to 0.1 by using this mask.
Color image encryption based on gyrator transform and Arnold transform
NASA Astrophysics Data System (ADS)
Sui, Liansheng; Gao, Bo
2013-06-01
A color image encryption scheme using gyrator transform and Arnold transform is proposed, which has two security levels. In the first level, the color image is separated into three components: red, green and blue, which are normalized and scrambled using the Arnold transform. The green component is combined with the first random phase mask and transformed to an interim using the gyrator transform. The first random phase mask is generated with the sum of the blue component and a logistic map. Similarly, the red component is combined with the second random phase mask and transformed to three-channel-related data. The second random phase mask is generated with the sum of the phase of the interim and an asymmetrical tent map. In the second level, the three-channel-related data are scrambled again and combined with the third random phase mask generated with the sum of the previous chaotic maps, and then encrypted into a gray scale ciphertext. The encryption result has stationary white noise distribution and camouflage property to some extent. In the process of encryption and decryption, the rotation angle of gyrator transform, the iterative numbers of Arnold transform, the parameters of the chaotic map and generated accompanied phase function serve as encryption keys, and hence enhance the security of the system. Simulation results and security analysis are presented to confirm the security, validity and feasibility of the proposed scheme.
Frequency shifts in distortion-product otoacoustic emissions evoked by swept tones
Shera, Christopher A.; Abdala, Carolina
2016-01-01
When distortion-product otoacoustic emissions (DPOAEs) are evoked using stimuli whose instantaneous frequencies change rapidly and continuously with time (swept tones), the oscillatory interference pattern known as distortion-product fine structure shifts slightly along the frequency axis in the same direction as the sweep. By analogy with the temporal mechanisms thought to underlie the differing efficacies of up- and down-swept stimuli as perceptual maskers (e.g., Schroeder-phase complexes), fine-structure shifts have been ascribed to the phase distortion associated with dispersive wave propagation in the cochlea. This paper tests an alternative hypothesis and finds that the observed shifts arise predominantly as a methodological side effect of the analysis procedures commonly used to extract delayed emissions from the measured time waveform. Approximate expressions for the frequency shifts of DPOAE distortion and reflection components are derived, validated with computer simulations, and applied to account for DPOAE fine-structure shifts measured in human subjects. Component magnitudes are shown to shift twice as much as component phases. Procedures for compensating swept-tone measurements to obtain estimates of the total DPOAE and its components measured at other sweep rates or in the sinusoidal steady state are presented. PMID:27586726
Wavefront coding for fast, high-resolution light-sheet microscopy (Conference Presentation)
NASA Astrophysics Data System (ADS)
Olarte, Omar E.; Licea-Rodriguez, Jacob; Loza-Alvarez, Pablo
2017-02-01
Some biological experiments demand the observation of dynamics processes in 3D with high spatiotemporal resolution. The use of wavefront coding to extend the depth-of-field (DOF) of the collection arm of a light-sheet microscope is an interesting alternative for fast 3D imaging. Under this scheme, the 3D features of the sample are captured at high volumetric rates while the light sheet is swept rapidly within the extended DOF. The DOF is extended by coding the pupil function of the imaging lens by using a custom-designed phase mask. A posterior restoration step is required to decode the information of the captured images based on the applied phase mask [1]. This hybrid optical-digital approach is known as wavefront coding (WFC). Previously, we have demonstrated this method for performing fast 3D imaging of biological samples at medium resolution [2]. In this work, we present the extension of this approach for high-resolution microscopes. Under these conditions, the effective DOF of a standard high NA objective is of a few micrometers. Here we demonstrate that by the use of WFC, we can extend the DOF more than one order of magnitude keeping the high-resolution imaging. This is demonstrated for two designed phase masks using Zebrafish and C. elegans samples. [1] Olarte, O.E., Andilla, J., Artigas, D., and Loza-Alvarez, P., "Decoupled Illumination-Detection Microscopy. Selected Optics in Year 2105," in Optics and Photonics news 26, p. 41 (2015). [2] Olarte, O.E., Andilla, J., Artigas, D., and Loza-Alvarez, P., "Decoupled illumination detection in light sheet microscopy for fast volumetric imaging," Optica 2(8), 702 (2015).
Fabrication of submicron metallic grids with interference and phase-mask holography
DOE Office of Scientific and Technical Information (OSTI.GOV)
Park, Joong-Mok; Kim, Tae-Geun; Constant, Kristen
2011-01-25
Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6%) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.
Characterization of Graphene-based FET Fabricated using a Shadow Mask
Tien, Dung Hoang; Park, Jun-Young; Kim, Ki Buem; Lee, Naesung; Seo, Yongho
2016-01-01
To pattern electrical metal contacts, electron beam lithography or photolithography are commonly utilized, and these processes require polymer resists with solvents. During the patterning process the graphene surface is exposed to chemicals, and the residue on the graphene surface was unable to be completely removed by any method, causing the graphene layer to be contaminated. A lithography free method can overcome these residue problems. In this study, we use a micro-grid as a shadow mask to fabricate a graphene based field-effect-transistor (FET). Electrical measurements of the graphene based FET samples are carried out in air and vacuum. It is found that the Dirac peaks of the graphene devices on SiO2 or on hexagonal boron nitride (hBN) shift from a positive gate voltage region to a negative region as air pressure decreases. In particular, the Dirac peaks shift very rapidly when the pressure decreases from ~2 × 10−3 Torr to ~5 × 10−5 Torr within 5 minutes. These Dirac peak shifts are known as adsorption and desorption of environmental gases, but the shift amounts are considerably different depending on the fabrication process. The high gas sensitivity of the device fabricated by shadow mask is attributed to adsorption on the clean graphene surface. PMID:27169620
Fabrication of Fiber-Optic Tilted Bragg Grating Filter in 40 nm Range with A Single Phase Mask
NASA Technical Reports Server (NTRS)
Grant, Joseph; Wang, Y.; Sharma, A.; Burdine, Robert V. (Technical Monitor)
2002-01-01
Fiber-optic Bragg grating filters are fabricated with a range of Bragg wavelength between 1296 and 1336 nm, using a single phase mask. 30 mW of continuous-wave light at 244 nm is used from a frequency-doubled argon-ion laser having an intracavity etalon. Gratings are fabricated by tilting the photosensitive fiber with respect to the phase mask up to an angle of 15 degrees. The variation of Bragg wavelength with the fiber-tilt is explained with a simple formula. High spatial coherence of 244 nm light makes it possible to displace the fiber as much as 6 mm in front of the phase mask and tilt the fiber by as much as 15 degrees. This results in nearly constant band-width and near 100% reflectively for all gratings throughout the 40 nm range.
NASA Astrophysics Data System (ADS)
Malloy, Matt; Litt, Lloyd C.
2012-11-01
A survey supported by SEMATECH and administered by David Powell Consulting was sent to semiconductor industry leaders to gather information about the mask industry as an objective assessment of its overall condition. The survey was designed with the input of semiconductor company mask technologists and merchant mask suppliers. 2012 marks the 11th consecutive year for the mask industry survey. This year's survey and reporting structure are similar to those of the previous years with minor modifications based on feedback from past years and the need to collect additional data on key topics. Categories include general mask information, mask processing, data and write time, yield and yield loss, delivery times, and maintenance and returns. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the mask industry. Results, initial observations, and key comparisons between the 2011 and 2012 survey responses are shown here, including multiple indications of a shift towards the manufacturing of higher end photomasks.
The retention and disruption of color information in human short-term visual memory.
Nemes, Vanda A; Parry, Neil R A; Whitaker, David; McKeefry, Declan J
2012-01-27
Previous studies have demonstrated that the retention of information in short-term visual perceptual memory can be disrupted by the presentation of masking stimuli during interstimulus intervals (ISIs) in delayed discrimination tasks (S. Magnussen & W. W. Greenlee, 1999). We have exploited this effect in order to determine to what extent short-term perceptual memory is selective for stimulus color. We employed a delayed hue discrimination paradigm to measure the fidelity with which color information was retained in short-term memory. The task required 5 color normal observers to discriminate between spatially non-overlapping colored reference and test stimuli that were temporally separated by an ISI of 5 s. The points of subjective equality (PSEs) on the resultant psychometric matching functions provided an index of performance. Measurements were made in the presence and absence of mask stimuli presented during the ISI, which varied in hue around the equiluminant plane in DKL color space. For all reference stimuli, we found a consistent mask-induced, hue-dependent shift in PSE compared to the "no mask" conditions. These shifts were found to be tuned in color space, only occurring for a range of mask hues that fell within bandwidths of 29-37 deg. Outside this range, masking stimuli had little or no effect on measured PSEs. The results demonstrate that memory masking for color exhibits selectivity similar to that which has already been demonstrated for other visual attributes. The relatively narrow tuning of these interference effects suggests that short-term perceptual memory for color is based on higher order, non-linear color coding. © ARVO
Frank, David W; Evans, Jennifer A; Gorman, Michael R
2010-04-01
Bright light has been established as the most ubiquitous environmental cue that entrains circadian timing systems under natural conditions. Light equivalent in intensity to moonlight (<1 lux), however, also strongly modulates circadian function in a number of entrainment paradigms. For example, compared to completely dark nights, dim nighttime illumination accelerated re-entrainment of hamster activity rhythms to 4-hour phase advances and delays of an otherwise standard laboratory photocycle. The purpose of this study was to determine if a sensitive period existed in the night during which dim illumination had a robust influence on speed of re-entrainment. Male Siberian hamsters were either exposed to dim light throughout the night, for half of the night, or not at all. Compared to dark nights, dim illumination throughout the entire night decreased by 29% the time for the midpoint of the active phase to re-entrain to a 4-hour phase advance and by 26% for a 4-hour delay. Acceleration of advances and delays were also achieved with 5 hours of dim light per night, but effects depended on whether dim light was present in the first half, second half, or first and last quarters of the night. Both during phase shifting and steady-state entrainment, partially lit nights also produced strong positive and negative masking effects, as well as entrainment aftereffects in constant darkness. Thus, even in the presence of a strong zeitgeber, light that might be encountered under a natural nighttime sky potently modulates the circadian timing system of hamsters.
Keus van de Poll, Marijke; Carlsson, Johannes; Marsh, John E; Ljung, Robert; Odelius, Johan; Schlittmeier, Sabine J; Sundin, Gunilla; Sörqvist, Patrik
2015-08-01
Broadband noise is often used as a masking sound to combat the negative consequences of background speech on performance in open-plan offices. As office workers generally dislike broadband noise, it is important to find alternatives that are more appreciated while being at least not less effective. The purpose of experiment 1 was to compare broadband noise with two alternatives-multiple voices and water waves-in the context of a serial short-term memory task. A single voice impaired memory in comparison with silence, but when the single voice was masked with multiple voices, performance was on level with silence. Experiment 2 explored the benefits of multiple-voice masking in more detail (by comparing one voice, three voices, five voices, and seven voices) in the context of word processed writing (arguably a more office-relevant task). Performance (i.e., writing fluency) increased linearly from worst performance in the one-voice condition to best performance in the seven-voice condition. Psychological mechanisms underpinning these effects are discussed.
Software-based data path for raster-scanned multi-beam mask lithography
NASA Astrophysics Data System (ADS)
Rajagopalan, Archana; Agarwal, Ankita; Buck, Peter; Geller, Paul; Hamaker, H. Christopher; Rao, Nagswara
2016-10-01
According to the 2013 SEMATECH Mask Industry Survey,i roughly half of all photomasks are produced using laser mask pattern generator ("LMPG") lithography. LMPG lithography can be used for all layers at mature technology nodes, and for many non-critical and semi-critical masks at advanced nodes. The extensive use of multi-patterning at the 14-nm node significantly increases the number of critical mask layers, and the transition in wafer lithography from positive tone resist to negative tone resist at the 14-nm design node enables the switch from advanced binary masks back to attenuated phase shifting masks that require second level writes to remove unwanted chrome. LMPG lithography is typically used for second level writes due to its high productivity, absence of charging effects, and versatile non-actinic alignment capability. As multi-patterning use expands from double to triple patterning and beyond, the number of LMPG second level writes increases correspondingly. The desire to reserve the limited capacity of advanced electron beam writers for use when essential is another factor driving the demand for LMPG capacity. The increasing demand for cost-effective productivity has kept most of the laser mask writers ever manufactured running in production, sometimes long past their projected lifespan, and new writers continue to be built based on hardware developed some years ago.ii The data path is a case in point. While state-ofthe- art when first introduced, hardware-based data path systems are difficult to modify or add new features to meet the changing requirements of the market. As data volumes increase, design styles change, and new uses are found for laser writers, it is useful to consider a replacement for this critical subsystem. The availability of low-cost, high-performance, distributed computer systems combined with highly scalable EDA software lends itself well to creating an advanced data path system. EDA software, in routine production today, scales well to hundreds or even thousands of CPU-cores, offering the potential for virtually unlimited capacity. Features available in EDA software such as sizing, scaling, tone reversal, OPC, MPC, rasterization, and others are easily adapted to the requirements of a data path system. This paper presents the motivation, requirements, design and performance of an advanced, scalable software data path system suitable to support multi-beam laser mask lithography.
Masking Period Patterns and Forward Masking for Speech-Shaped Noise: Age-Related Effects.
Grose, John H; Menezes, Denise C; Porter, Heather L; Griz, Silvana
2016-01-01
The purpose of this study was to assess age-related changes in temporal resolution in listeners with relatively normal audiograms. The hypothesis was that increased susceptibility to nonsimultaneous masking contributes to the hearing difficulties experienced by older listeners in complex fluctuating backgrounds. Participants included younger (n = 11), middle-age (n = 12), and older (n = 11) listeners with relatively normal audiograms. The first phase of the study measured masking period patterns for speech-shaped noise maskers and signals. From these data, temporal window shapes were derived. The second phase measured forward-masking functions and assessed how well the temporal window fits accounted for these data. The masking period patterns demonstrated increased susceptibility to backward masking in the older listeners, compatible with a more symmetric temporal window in this group. The forward-masking functions exhibited an age-related decline in recovery to baseline thresholds, and there was also an increase in the variability of the temporal window fits to these data. This study demonstrated an age-related increase in susceptibility to nonsimultaneous masking, supporting the hypothesis that exacerbated nonsimultaneous masking contributes to age-related difficulties understanding speech in fluctuating noise. Further support for this hypothesis comes from limited speech-in-noise data, suggesting an association between susceptibility to forward masking and speech understanding in modulated noise.
Complex Pupil Masks for Aberrated Imaging of Closely Spaced Objects
NASA Astrophysics Data System (ADS)
Reddy, A. N. K.; Sagar, D. K.; Khonina, S. N.
2017-12-01
Current approach demonstrates the suppression of optical side-lobes and the contraction of the main lobe in the composite image of two object points of the optical system under the influence of defocusing effect when an asymmetric phase edges are imposed over the apodized circular aperture. The resolution of two point sources having different intensity ratio is discussed in terms of the modified Sparrow criterion, functions of the degree of coherence of the illumination, the intensity difference and the degree of asymmetric phase masking. Here we have introduced and explored the effects of focus aberration (defect-of-focus) on the two-point resolution of the optical systems. Results on the aberrated composite image of closely spaced objects with amplitude mask and asymmetric phase masks forms a significant contribution in astronomical and microscopic observations.
Video encryption using chaotic masks in joint transform correlator
NASA Astrophysics Data System (ADS)
Saini, Nirmala; Sinha, Aloka
2015-03-01
A real-time optical video encryption technique using a chaotic map has been reported. In the proposed technique, each frame of video is encrypted using two different chaotic random phase masks in the joint transform correlator architecture. The different chaotic random phase masks can be obtained either by using different iteration levels or by using different seed values of the chaotic map. The use of different chaotic random phase masks makes the decryption process very complex for an unauthorized person. Optical, as well as digital, methods can be used for video encryption but the decryption is possible only digitally. To further enhance the security of the system, the key parameters of the chaotic map are encoded using RSA (Rivest-Shamir-Adleman) public key encryption. Numerical simulations are carried out to validate the proposed technique.
Luiga, I; Bachmann, T
2007-11-01
Enns and Di Lollo [Psychological Science, 8 (2), 135-139, 1997] have introduced the object substitution theory of visual masking. Object substitution masking occurs when focusing attention on the target is delayed. However, Posner (Quarterly Journal of Experimental Psychology, 32, 3-25, 1980) has already shown that attention can be directed to a target at least in two ways: intentionally (endogenously) and automatically (exogenously). We conducted two experiments to explore the effects of endogenous and exogenous cues on substitution masking. The results showed that when attention was shifted to the target location automatically (using a local peripheral pre-cue), masking was attenuated. A decrease in target identification dependent on a delay of mask offset, typical to substitution masking, was not observed. However, strong substitution masking occurred when the target location was not pre-cued or when attention was directed to the target location intentionally (using a symbolic pre-cue displayed centrally). The hypothesis of two different mechanisms of attentional control in substitution masking was confirmed.
NASA Astrophysics Data System (ADS)
Shao, Feng; Evanschitzky, Peter; Fühner, Tim; Erdmann, Andreas
2009-10-01
This paper employs the Waveguide decomposition method as an efficient rigorous electromagnetic field (EMF) solver to investigate three dimensional mask-induced imaging artifacts in EUV lithography. The major mask diffraction induced imaging artifacts are first identified by applying the Zernike analysis of the mask nearfield spectrum of 2D lines/spaces. Three dimensional mask features like 22nm semidense/dense contacts/posts, isolated elbows and line-ends are then investigated in terms of lithographic results. After that, the 3D mask-induced imaging artifacts such as feature orientation dependent best focus shift, process window asymmetries, and other aberration-like phenomena are explored for the studied mask features. The simulation results can help lithographers to understand the reasons of EUV-specific imaging artifacts and to devise illumination and feature dependent strategies for their compensation in the optical proximity correction (OPC) for EUV masks. At last, an efficient approach using the Zernike analysis together with the Waveguide decomposition technique is proposed to characterize the impact of mask properties for the future OPC process.
Exploring the additivity of binaural and monaural masking release
Hall, Joseph W.; Buss, Emily; Grose, John H.
2011-01-01
Experiment 1 examined comodulation masking release (CMR) for a 700-Hz tonal signal under conditions of NoSo (noise and signal interaurally in phase) and NoSπ (noise in phase, signal out of phase) stimulation. The baseline stimulus for CMR was either a single 24-Hz wide narrowband noise centered on the signal frequency [on-signal band (OSB)] or the OSB plus, a set of flanking noise bands having random envelopes. Masking noise was either gated or continuous. The CMR, defined with respect to either the OSB or the random noise baseline, was smaller for NoSπ than NoSo stimulation, particularly when the masker was continuous. Experiment 2 examined whether the same pattern of results would be obtained for a 2000-Hz signal frequency; the number of flanking bands was also manipulated (two versus eight). Results again showed smaller CMR for NoSπ than NoSo stimulation for both continuous and gated masking noise. The CMR was larger with eight than with two flanking bands, and this difference was greater for NoSo than NoSπ. The results of this study are compatible with serial mechanisms of binaural and monaural masking release, but they indicate that the combined masking release (binaural masking-level difference and CMR) falls short of being additive. PMID:21476663
System Construction for the Measurement of Bragg Grating Characteristics in Optical Fibers
NASA Technical Reports Server (NTRS)
West, Douglas P.
1995-01-01
Bragg gratings are used to measure strain in optical fibers. To measure strain they are sometimes used as a smart structure. They must be characterized after they are written to determine their spectral response. This paper deals with the test setup to characterize Bragg grating spectral responses.Bragg gratings are a photo-induced phenomena in optical fibers. The gratings can be used to measure strain by measuring the shift in wavelength. They placed the fibers into a smart structure to measure the stress and strain produced on support columns placed in bridges. As the cable is subjected to strain the grating causes a shift to a longer wavelength if the fiber is stretched and a shift to a shorter wavelength shift if the fiber is compacted. Our applications involve using the fibers to measure stress and strain on airborne systems. There are many ways to write Bragg gratings into optical fibers. Our focus is on side writing the grating. Our capabilities are limited in the production rate of the gratings. The Bragg grating is written into a fiber and becomes a permanent fixture. We are writing the grating to be centered at 1300 nm because that is the standard phase mask wavelength.
Research of optical coherence tomography microscope based on CCD detector
NASA Astrophysics Data System (ADS)
Zhang, Hua; Xu, Zhongbao; Zhang, Shuomo
2008-12-01
The reference wave phase was modulated with a sinusoidal vibrating mirror attached to a Piezoelectric Transducer (PZT), the integration was performed by a CCD, and the charge storage period of the CCD image sensor was one-quarter period of the sinusoidal phase modulation. With the frequency- synchronous detection technique, four images (four frames of interference pattern) were recorded during one period of the phase modulation. In order to obtain the optimum modulation parameter, the values of amplitude and phase of the sinusoidal phase modulation were determined by considering the measurement error caused by the additive noise contained in the detected values. The PZT oscillation was controlled by a closed loop control system based on PID controller. An ideal discrete digital sine function at 50Hz with adjustable amplitude was used to adjust the vibrating of PZT, and a digital phase shift techniques was used to adjust vibrating phase of PZT so that the phase of the modulation could reach their optimum values. The CCD detector was triggered with software at 200Hz. Based on work above a small coherent signal masked by the preponderant incoherent background with a CCD detector was obtained.
Defect tolerant transmission lithography mask
Vernon, Stephen P.
2000-01-01
A transmission lithography mask that utilizes a transparent substrate or a partially transparent membrane as the active region of the mask. A reflective single layer or multilayer coating is deposited on the membrane surface facing the illumination system. The coating is selectively patterned (removed) to form transmissive (bright) regions. Structural imperfections and defects in the coating have negligible effect on the aerial image of the mask master pattern since the coating is used to reflect radiation out of the entrance pupil of the imaging system. Similarly, structural imperfections in the clear regions of the membrane have little influence on the amplitude or phase of the transmitted electromagnetic fields. Since the mask "discards," rather than absorbs, unwanted radiation, it has reduced optical absorption and reduced thermal loading as compared to conventional designs. For EUV applications, the mask circumvents the phase defect problem, and is independent of the thermal load during exposure.
Challenges in process marginality for advanced technology nodes and tackling its contributors
NASA Astrophysics Data System (ADS)
Narayana Samy, Aravind; Schiwon, Roberto; Seltmann, Rolf; Kahlenberg, Frank; Katakamsetty, Ushasree
2013-10-01
Process margin is getting critical in the present node shrinkage scenario due to the physical limits reached (Rayleigh's criterion) using ArF lithography tools. K1 is used to its best for better resolution and to enhance the process margin (28nm metal patterning k1=0.31). In this paper, we would like to give an overview of various contributors in the advanced technology nodes which limit the process margins and how the challenges have been tackled in a modern foundry model. Advanced OPC algorithms are used to make the design content at the mask optimum for patterning. However, as we work at the physical limit, critical features (Hot-spots) are very susceptible to litho process variations. Furthermore, etch can have a significant impact as well. Pattern that still looks healthy at litho can fail due to etch interactions. This makes the traditional 2D contour output from ORC tools not able to predict accurately all defects and hence not able to fully correct it in the early mask tapeout phase. The above makes a huge difference in the fast ramp-up and high yield in a competitive foundry market. We will explain in this paper how the early introduction of 3D resist model based simulation of resist profiles (resist top-loss, bottom bridging, top-rounding, etc.,) helped in our prediction and correction of hot-spots in the early 28nm process development phase. The paper also discusses about the other overall process window reduction contributors due to mask 3D effects, wafer topography (focus shifts/variations) and how this has been addressed with different simulation efforts in a fast and timely manner.
Forward masking of frequency modulationa
Byrne, Andrew J.; Wojtczak, Magdalena; Viemeister, Neal F.
2012-01-01
Forward masking of sinusoidal frequency modulation (FM) was measured with three types of maskers: FM, amplitude modulation (AM), and a masker created by combining the magnitude spectrum of an FM tone with random component phases. For the signal FM rates used (5, 20, and 40 Hz), an FM masker raised detection thresholds in terms of frequency deviation by a factor of about 5 relative to without a masker. The AM masker produced a much smaller effect, suggesting that FM-to-AM conversion did not contribute substantially to the FM forward masking. The modulation depth of an FM masker had a nonmonotonic effect, with maximal masking observed at an intermediate value within the range of possible depths, while the random-phase FM masker produced less masking, arguing against a spectrally-based explanation for FM forward masking. Broad FM-rate selectivity for forward masking was observed for both 4-kHz and 500-Hz carriers. Thresholds measured as a function of the masker-signal delay showed slow recovery from FM forward masking, with residual masking for delays up to 500 ms. The FM forward-masking effect resembles that observed for AM [Wojtczak and Viemeister (2005). J. Acoust. Soc. Am. 188, 3198–3210] and may reflect modulation-rate selective neural adaptation to FM. PMID:23145618
NASA Astrophysics Data System (ADS)
Yadav, Poonam Lata; Singh, Hukum
2018-05-01
To enhance the security in optical image encryption system and to protect it from the attackers, this paper proposes new digital spiral phase mask based on Fresnel Transform. In this cryptosystem the Spiral Phase Mask (SPM) used is a hybrid of Fresnel Zone Plate (FZP) and Radial Hilbert Mask (RHM) which makes the key strong and enhances the security. The different keys used for encryption and decryption purposed make the system much more secure. Proposed scheme uses various structured phase mask which increases the key space also it increases the number of parameters which makes it difficult for the attackers to exactly find the key to recover the original image. We have also used different keys for encryption and decryption purpose to make the system much more secure. The strength of the proposed cryptosystem has been analyzed by simulating on MATLAB 7.9.0(R2008a). Mean Square Errors (MSE) and Peak Signal to Noise Ratio (PSNR) are calculated for the proposed algorithm. The experimental results are provided to highlight the effectiveness and sustainability of proposed cryptosystem and to prove that the cryptosystem is secure for usage.
Villaverde Rozados, María José; Mos Reguera, M Esther; González Argibay, M Concepción; Sixto Gato, Sandra; Radío, Beatriz Alfonso; Fernández Díaz, María José
2003-11-01
A laryngeal mask is a very useful instrument to use both in easy as well as difficult handling situations related to the air tract. This mask is placed in the pharynx and it permits a patient to breathe in different modes, either spontaneously or mechanically. Different models are available; some even facilitate the tracheal intubation through the mask. The authors highlight that this type of mask does not protect nor isolate the air tract. As advantages, the authors point out its easy installation; thus, it is an alternative when an air tract presents difficulties; therefore, it is necessary that all personnel who have to deal with the air tract be aware of this mask and know how to handle it.
Masking Period Patterns & Forward Masking for Speech-Shaped Noise: Age-related effects
Grose, John H.; Menezes, Denise C.; Porter, Heather L.; Griz, Silvana
2015-01-01
Objective The purpose of this study was to assess age-related changes in temporal resolution in listeners with relatively normal audiograms. The hypothesis was that increased susceptibility to non-simultaneous masking contributes to the hearing difficulties experienced by older listeners in complex fluctuating backgrounds. Design Participants included younger (n = 11), middle-aged (n = 12), and older (n = 11) listeners with relatively normal audiograms. The first phase of the study measured masking period patterns for speech-shaped noise maskers and signals. From these data, temporal window shapes were derived. The second phase measured forward-masking functions, and assessed how well the temporal window fits accounted for these data. Results The masking period patterns demonstrated increased susceptibility to backward masking in the older listeners, compatible with a more symmetric temporal window in this group. The forward-masking functions exhibited an age-related decline in recovery to baseline thresholds, and there was also an increase in the variability of the temporal window fits to these data. Conclusions This study demonstrated an age-related increase in susceptibility to non-simultaneous masking, supporting the hypothesis that exacerbated non-simultaneous masking contributes to age-related difficulties understanding speech in fluctuating noise. Further support for this hypothesis comes from limited speech-in-noise data suggesting an association between susceptibility to forward masking and speech understanding in modulated noise. PMID:26230495
Depth map generation using a single image sensor with phase masks.
Jang, Jinbeum; Park, Sangwoo; Jo, Jieun; Paik, Joonki
2016-06-13
Conventional stereo matching systems generate a depth map using two or more digital imaging sensors. It is difficult to use the small camera system because of their high costs and bulky sizes. In order to solve this problem, this paper presents a stereo matching system using a single image sensor with phase masks for the phase difference auto-focusing. A novel pattern of phase mask array is proposed to simultaneously acquire two pairs of stereo images. Furthermore, a noise-invariant depth map is generated from the raw format sensor output. The proposed method consists of four steps to compute the depth map: (i) acquisition of stereo images using the proposed mask array, (ii) variational segmentation using merging criteria to simplify the input image, (iii) disparity map generation using the hierarchical block matching for disparity measurement, and (iv) image matting to fill holes to generate the dense depth map. The proposed system can be used in small digital cameras without additional lenses or sensors.
NASA Astrophysics Data System (ADS)
Lin, Chao; Shen, Xueju; Hua, Binbin; Wang, Zhisong
2015-10-01
We demonstrate the feasibility of three dimensional (3D) polarization multiplexing by optimizing a single vectorial beam using a multiple-signal window multiple-plane (MSW-MP) phase retrieval algorithm. Original messages represented with multiple quick response (QR) codes are first partitioned into a series of subblocks. Then, each subblock is marked with a specific polarization state and randomly distributed in 3D space with both longitudinal and transversal adjustable freedoms. A generalized 3D polarization mapping protocol is established to generate a 3D polarization key. Finally, multiple-QR code is encrypted into one phase only mask and one polarization only mask based on the modified Gerchberg-Saxton (GS) algorithm. We take the polarization mask as the cyphertext and the phase only mask as additional dimension of key. Only when both the phase key and 3D polarization key are correct, original messages can be recovered. We verify our proposal with both simulation and experiment evidences.
Optical image encryption system using nonlinear approach based on biometric authentication
NASA Astrophysics Data System (ADS)
Verma, Gaurav; Sinha, Aloka
2017-07-01
A nonlinear image encryption scheme using phase-truncated Fourier transform (PTFT) and natural logarithms is proposed in this paper. With the help of the PTFT, the input image is truncated into phase and amplitude parts at the Fourier plane. The phase-only information is kept as the secret key for the decryption, and the amplitude distribution is modulated by adding an undercover amplitude random mask in the encryption process. Furthermore, the encrypted data is kept hidden inside the face biometric-based phase mask key using the base changing rule of logarithms for secure transmission. This phase mask is generated through principal component analysis. Numerical experiments show the feasibility and the validity of the proposed nonlinear scheme. The performance of the proposed scheme has been studied against the brute force attacks and the amplitude-phase retrieval attack. Simulation results are presented to illustrate the enhanced system performance with desired advantages in comparison to the linear cryptosystem.
Güder, Firat; Yang, Yang; Krüger, Michael; Stevens, Gregory B; Zacharias, Margit
2010-12-01
A versatile, low-cost, and flexible approach is presented for the fabrication of millimeter-long, sub-100 nm wide 1D nanochannels with tunable wall properties (wall thickness and material) over wafer-scale areas on glass, alumina, and silicon surfaces. This approach includes three fabrication steps. First, sub-100 nm photoresist line patterns were generated by near-field contact phase-shift lithography (NFC-PSL) using an inexpensive homemade borosilicate mask (NFC-PSM). Second, various metal oxides were directly coated on the resist patterns with low-temperature atomic layer deposition (ALD). Finally, the remaining photoresist was removed via an acetone dip, and then planar nanochannel arrays were formed on the substrate. In contrast to all the previous fabrication routes, the sub-100 nm photoresist line patterns produced by NFC-PSL are directly employed as a sacrificial layer for the creation of nanochannels. Because both the NFC-PSL and the ALD deposition are highly reproducible processes, the strategy proposed here can be regarded as a general route for nanochannel fabrication in a simplified and reliable manner. In addition, the fabricated nanochannels were used as templates to synthesize various organic and inorganic 1D nanostructures on the substrate surface.
Automatic emotion processing as a function of trait emotional awareness: an fMRI study
Lichev, Vladimir; Sacher, Julia; Ihme, Klas; Rosenberg, Nicole; Quirin, Markus; Lepsien, Jöran; Pampel, André; Rufer, Michael; Grabe, Hans-Jörgen; Kugel, Harald; Kersting, Anette; Villringer, Arno; Lane, Richard D.
2015-01-01
It is unclear whether reflective awareness of emotions is related to extent and intensity of implicit affective reactions. This study is the first to investigate automatic brain reactivity to emotional stimuli as a function of trait emotional awareness. To assess emotional awareness the Levels of Emotional Awareness Scale (LEAS) was administered. During scanning, masked happy, angry, fearful and neutral facial expressions were presented to 46 healthy subjects, who had to rate the fit between artificial and emotional words. The rating procedure allowed assessment of shifts in implicit affectivity due to emotion faces. Trait emotional awareness was associated with increased activation in the primary somatosensory cortex, inferior parietal lobule, anterior cingulate gyrus, middle frontal and cerebellar areas, thalamus, putamen and amygdala in response to masked happy faces. LEAS correlated positively with shifts in implicit affect caused by masked happy faces. According to our findings, people with high emotional awareness show stronger affective reactivity and more activation in brain areas involved in emotion processing and simulation during the perception of masked happy facial expression than people with low emotional awareness. High emotional awareness appears to be characterized by an enhanced positive affective resonance to others at an automatic processing level. PMID:25140051
Exploring the additivity of binaural and monaural masking release.
Hall, Joseph W; Buss, Emily; Grose, John H
2011-04-01
Experiment 1 examined comodulation masking release (CMR) for a 700-Hz tonal signal under conditions of N(o)S(o) (noise and signal interaurally in phase) and N(o)S(π) (noise in phase, signal out of phase) stimulation. The baseline stimulus for CMR was either a single 24-Hz wide narrowband noise centered on the signal frequency [on-signal band (OSB)] or the OSB plus, a set of flanking noise bands having random envelopes. Masking noise was either gated or continuous. The CMR, defined with respect to either the OSB or the random noise baseline, was smaller for N(o)S(π) than N(o)S(o) stimulation, particularly when the masker was continuous. Experiment 2 examined whether the same pattern of results would be obtained for a 2000-Hz signal frequency; the number of flanking bands was also manipulated (two versus eight). Results again showed smaller CMR for N(o)S(π) than N(o)S(o) stimulation for both continuous and gated masking noise. The CMR was larger with eight than with two flanking bands, and this difference was greater for N(o)S(o) than N(o)S(π). The results of this study are compatible with serial mechanisms of binaural and monaural masking release, but they indicate that the combined masking release (binaural masking-level difference and CMR) falls short of being additive.
Chiambaretta, Frederic; Pleyer, Uwe; Behndig, Anders; Pisella, Pierre-Jean; Mertens, Erik; Limao, Antonio; Fasce, Francesco; Fernandez, Joaquin; Benmoussa, Salah-Eddine; Labetoulle, Marc; Cochener, Beatrice
2018-03-01
To compare the pupil dynamics of an intracameral combination of 2 mydriatics and 1 anesthetic (Mydrane) to a standard topical regimen for cataract surgery. Sixty-two centers in Europe and 6 centers in Algeria. Prospective case series. Pupil size measurements were performed in 2 randomized studies (phase 2 and phase 3) under masked conditions (recorded videography, masked reading center). The outcomes in the phase 2 study supported evaluation of the timeframe to obtain pupil dilation and the phase 3 study provided results on mydriasis stability. Phase 2 and phase 3 comprised 139 patients and 591 patients, respectively. After intracameral combination administration, 95% of the pupil dilation was achieved within a mean of 28.6 seconds ± 4.6 (SD). At the beginning of capsulorhexis creation, the mean pupil diameter was larger than 7.0 mm in both groups. The intraoperative pupil diameter remained stable in the intracameral combination group and decreased in the topical group. The mean change in pupil size just before capsulorhexis to the end of surgery (just before cefuroxime injection) was -0.22 ± 0.72 mm and -1.67 ± 0.98 mm, respectively. No clinically significant change in pupil diameter (change <1.0 mm) occurred in the majority of the intracameral combination group (89.3%) compared with the topical group (26.8%). Intracameral combination of 2 mydriatics and 1 anesthetic is an alternative to topical mydriatics for cataract surgery. The prompt onset of pupil dilation and the stable mydriasis induced by this drug combination improved the intraoperative conditions during crucial steps, such as intraocular lens implantation. Copyright © 2018. Published by Elsevier Inc.
Phase measurements of EUV mask defects
Claus, Rene A.; Wang, Yow-Gwo; Wojdyla, Antoine; ...
2015-02-22
Extreme Ultraviolet (EUV) Lithography mask defects were examined on the actinic mask imaging system, SHARP, at Lawrence Berkeley National Laboratory. Also, a quantitative phase retrieval algorithm based on the Weak Object Transfer Function was applied to the measured through-focus aerial images to examine the amplitude and phase of the defects. The accuracy of the algorithm was demonstrated by comparing the results of measurements using a phase contrast zone plate and a standard zone plate. Using partially coherent illumination to measure frequencies that would otherwise fall outside the numerical aperture (NA), it was shown that some defects are smaller than themore » conventional resolution of the microscope. We found that the programmed defects of various sizes were measured and shown to have both an amplitude and a phase component that the algorithm is able to recover.« less
Evaluation of the Sierra, hanging, quick-don, crew, pressure-breathing, oxygen mask.
DOT National Transportation Integrated Search
1966-06-01
A new design, hanging, quick-don crew pressure breathing oxygen mask applicable to jet-transport operations was tested and evaluated in three phases, consisting of (1) exposing five masked subjects to a stepwise altitude-chamber flight profile with a...
The Regime Shift Associated with the 2004–2008 US Housing Market Bubble
Cheong, Siew Ann
2016-01-01
The Subprime Bubble preceding the Subprime Crisis of 2008 was fueled by risky lending practices, manifesting in the form of a large abrupt increase in the proportion of subprime mortgages issued in the US. This event also coincided with critical slowing down signals associated with instability, which served as evidence of a regime shift or phase transition in the US housing market. Here, we show that the US housing market underwent a regime shift between alternate stable states consistent with the observed critical slowing down signals. We modeled this regime shift on a universal transition path and validated the model by estimating when the bubble burst. Additionally, this model reveals loose monetary policy to be a plausible cause of the phase transition, implying that the bubble might have been deflatable by a timely tightening of monetary policy. PMID:27583633
Color masking of developmental enamel defects: a case series.
Torres, C R G; Borges, A B
2015-01-01
Developmental defects involving color alteration of enamel frequently compromise the esthetic appearance of the tooth. The resin infiltration technique represents an alternative treatment for color masking of these lesions and uniformization of tooth color. This technique is considered relatively simple and microinvasive, since only a minimal portion of enamel is removed. This article illustrates the color-masking effect with resin infiltration of fluorosis and traumatic hypomineralization lesions with a case series. The final esthetic outcomes demonstrated the ability of the resin infiltrant to mask the color of white developmental defect lesions, resulting in satisfactory clinical esthetic improvements. However, in more severe cases, the color-masking effect was not complete.
A Low Cost TDRSS Compatible Transmitter Option
NASA Technical Reports Server (NTRS)
Whiteman, Don
2005-01-01
The NASA Space-based Telemetry and Range Safety (STARS) program has developed and tested a low cost Ku-Band transmitter alternative for TDRSS applications based on an existing IRIG shaped offset quaternary phase shift keying (SOQPSK) transmitter. This paper presents information related to the implementation of this low cost system, as well as performance measurements of the alternative TDRSS transmitter system compared with an existing QPSK TDRSS transmitter.
Asymmetric multiple-image encryption based on the cascaded fractional Fourier transform
NASA Astrophysics Data System (ADS)
Li, Yanbin; Zhang, Feng; Li, Yuanchao; Tao, Ran
2015-09-01
A multiple-image cryptosystem is proposed based on the cascaded fractional Fourier transform. During an encryption procedure, each of the original images is directly separated into two phase masks. A portion of the masks is subsequently modulated into an interim mask, which is encrypted into the ciphertext image; the others are used as the encryption keys. Using phase truncation in the fractional Fourier domain, one can use an asymmetric cryptosystem to produce a real-valued noise-like ciphertext, while a legal user can reconstruct all of the original images using a different group of phase masks. The encryption key is an indivisible part of the corresponding original image and is still useful during decryption. The proposed system has high resistance to various potential attacks, including the chosen-plaintext attack. Numerical simulations also demonstrate the security and feasibility of the proposed scheme.
Fabrication of fiber Bragg gratings in embedded-core hollow optical fiber
NASA Astrophysics Data System (ADS)
Mao, Guopei; Sun, Bo; Yuan, Tingting; Zhong, Xing; Shi, Jinhui; Guan, Chunying; Yuan, Libo
2015-07-01
A novel Bragg fiber grating (FBG) in an embedded-core hollow optical fiber (ECHOF) has been proposed and experimentally demonstrated. The high-quality FBG fabricated with phase-mask technique by using 248 nm ultraviolet laser, has a resonant wavelength of ~943.1 nm and a dip of ~24.2 dB. Subsequently, the dependences of the resonant peak on the temperature and the axial strain were studied. Experimental results show that the temperature and axial stain sensitivity are 6.5 pm/°С and 1.1 pm/μɛ, respectively. In addition, a 0.03 nm shift of the transmission dip can be obtained when the polarization state changes from X polarization to Y polarization.
NASA Technical Reports Server (NTRS)
Monk, Timothy H.
1991-01-01
Three interacting processes are involved in the preservation of circadian rhythms: (1) endogenous rhythm generation mechanisms, (2) entrainment mechanisms to keep these rhythms 'on track', and (3) exogenous masking processes stemming from changes in environment and bahavior. These processes, particularly the latter two, can be dramatically affected in individuals of advanced age and in space travelers, with a consequent disruption in sleep and daytime functioning. This paper presents results of a phase-shift experiment investigating the age-related effects of the exogeneous component of circadian rhythms in various physiological and psychological functions by comparing these functions in middle aged and old subjects. Dramatic differences were found between the two age groups in measures of sleep, mood, activation, and performance efficiency.
2008-10-28
S. H. Ridgway (2003), "Temporary Threshold Shift (TTS) Measurements in Bottlenose Dolphins (Tursiops truncatus), Belugas ( Delphinapterus leucas ...34Temporary Shift in Masked Hearing Thresholds (MTTS) of Bottlenose Dolphins, Tursiops truncatus, and White Whales, Delphinapterus leucas , after Exposure
Water-fat separation with parallel imaging based on BLADE.
Weng, Dehe; Pan, Yanli; Zhong, Xiaodong; Zhuo, Yan
2013-06-01
Uniform suppression of fat signal is desired in clinical applications. Based on phase differences introduced by different chemical shift frequencies, Dixon method and its variations are used as alternatives of fat saturation methods, which are sensitive to B0 inhomogeneities. Iterative Decomposition of water and fat with Echo Asymmetry and Least squares estimation (IDEAL) separates water and fat images with flexible echo shifting. Periodically Rotated Overlapping ParallEL Lines with Enhanced Reconstruction (PROPELLER, alternatively termed as BLADE), in conjunction with IDEAL, yields Turboprop IDEAL (TP-IDEAL) and allows for decomposition of water and fat signal with motion correction. However, the flexibility of its parameter setting is limited, and the related phase correction is complicated. To address these problems, a novel method, BLADE-Dixon, is proposed in this study. This method used the same polarity readout gradients (fly-back gradients) to acquire in-phase and opposed-phases images, which led to less complicated phase correction and more flexible parameter setting compared to TP-IDEAL. Parallel imaging and undersampling were integrated to reduce scan time. Phantom, orbit, neck and knee images were acquired with BLADE-Dixon. Water-fat separation results were compared to those measured with conventional turbo spin echo (TSE) Dixon and TSE with fat saturation, respectively, to demonstrate the performance of BLADE-Dixon. Copyright © 2013 Elsevier Inc. All rights reserved.
Eibofner, Frank; Martirosian, Petros; Würslin, Christian; Graf, Hansjörg; Syha, Roland; Clasen, Stephan
2015-11-01
In interventional magnetic resonance imaging, instruments can be equipped with conducting wires for visualization by current application. The potential of sequence triggered application of transient direct currents in balanced steady-state free precession (bSSFP) imaging is demonstrated. A conductor and a modified catheter were examined in water phantoms and in an ex vivo porcine liver. The current was switched by a trigger pulse in the bSSFP sequence in an interval between radiofrequency pulse and signal acquisition. Magnitude and phase images were recorded. Regions with transient field alterations were evaluated by a postprocessing algorithm. A phase mask was computed and overlaid with the magnitude image. Transient field alterations caused continuous phase shifts, which were separated by the postprocessing algorithm from phase jumps due to persistent field alterations. The overlaid images revealed the position of the conductor. The modified catheter generated visible phase offset in all orientations toward the static magnetic field and could be unambiguously localized in the ex vivo porcine liver. The application of a sequence triggered, direct current in combination with phase imaging allows conspicuous localization of interventional devices with a bSSFP sequence.
A cluster randomised trial of cloth masks compared with medical masks in healthcare workers
MacIntyre, C Raina; Seale, Holly; Dung, Tham Chi; Hien, Nguyen Tran; Nga, Phan Thi; Chughtai, Abrar Ahmad; Rahman, Bayzidur; Dwyer, Dominic E; Wang, Quanyi
2015-01-01
Objective The aim of this study was to compare the efficacy of cloth masks to medical masks in hospital healthcare workers (HCWs). The null hypothesis is that there is no difference between medical masks and cloth masks. Setting 14 secondary-level/tertiary-level hospitals in Hanoi, Vietnam. Participants 1607 hospital HCWs aged ≥18 years working full-time in selected high-risk wards. Intervention Hospital wards were randomised to: medical masks, cloth masks or a control group (usual practice, which included mask wearing). Participants used the mask on every shift for 4 consecutive weeks. Main outcome measure Clinical respiratory illness (CRI), influenza-like illness (ILI) and laboratory-confirmed respiratory virus infection. Results The rates of all infection outcomes were highest in the cloth mask arm, with the rate of ILI statistically significantly higher in the cloth mask arm (relative risk (RR)=13.00, 95% CI 1.69 to 100.07) compared with the medical mask arm. Cloth masks also had significantly higher rates of ILI compared with the control arm. An analysis by mask use showed ILI (RR=6.64, 95% CI 1.45 to 28.65) and laboratory-confirmed virus (RR=1.72, 95% CI 1.01 to 2.94) were significantly higher in the cloth masks group compared with the medical masks group. Penetration of cloth masks by particles was almost 97% and medical masks 44%. Conclusions This study is the first RCT of cloth masks, and the results caution against the use of cloth masks. This is an important finding to inform occupational health and safety. Moisture retention, reuse of cloth masks and poor filtration may result in increased risk of infection. Further research is needed to inform the widespread use of cloth masks globally. However, as a precautionary measure, cloth masks should not be recommended for HCWs, particularly in high-risk situations, and guidelines need to be updated. Trial registration number Australian New Zealand Clinical Trials Registry: ACTRN12610000887077. PMID:25903751
Arctic Climate and Atmospheric Planetary Waves
NASA Technical Reports Server (NTRS)
Cavalieri, D. J.; Haekkinen, S.
2000-01-01
Analysis of a fifty-year record (1946-1995) of monthly-averaged sea level pressure data provides a link between the phases of planetary-scale sea level pressure waves and Arctic Ocean and ice variability. Results of this analysis show: (1) a breakdown of the dominant wave I pattern in the late 1960's, (2) shifts in the mean phase of waves 1 and 2 since this breakdown, (3) an eastward shift in the phases of both waves 1 and 2 during the years of simulated cyclonic Arctic Ocean circulation relative to their phases during the years of anticyclonic circulation, (4) a strong decadal variability of wave phase associated with simulated Arctic Ocean circulation changes. Finally, the Arctic atmospheric circulation patterns that emerge when waves 1 and 2 are in their extreme eastern and western positions suggest an alternative approach to determine significant forcing patterns of sea ice and high-latitude variability.
Formation of multiple focal spots using a high NA lens with a complex spiral phase mask
NASA Astrophysics Data System (ADS)
Lalithambigai, K.; Anbarasan, P. M.; Rajesh, K. B.
2014-07-01
The formation of a transversally polarized beam by transmitting a tightly focused double-ring-shaped azimuthally polarized beam through a complex spiral phase mask and high numerical aperture lens is presented based on vector diffraction theory. The generation of transversally polarized focal spot segment splitting and multiple focal spots is illustrated numerically. Moreover, we found that a properly designed complex spiral phase mask can move the focal spots along the optical axis in the z direction. Therefore, one can achieve a focal segment of two, three or multiple completely transversely polarized focal spots, which finds applications in optical trapping and in material processing technologies.
Coherent multiscale image processing using dual-tree quaternion wavelets.
Chan, Wai Lam; Choi, Hyeokho; Baraniuk, Richard G
2008-07-01
The dual-tree quaternion wavelet transform (QWT) is a new multiscale analysis tool for geometric image features. The QWT is a near shift-invariant tight frame representation whose coefficients sport a magnitude and three phases: two phases encode local image shifts while the third contains image texture information. The QWT is based on an alternative theory for the 2-D Hilbert transform and can be computed using a dual-tree filter bank with linear computational complexity. To demonstrate the properties of the QWT's coherent magnitude/phase representation, we develop an efficient and accurate procedure for estimating the local geometrical structure of an image. We also develop a new multiscale algorithm for estimating the disparity between a pair of images that is promising for image registration and flow estimation applications. The algorithm features multiscale phase unwrapping, linear complexity, and sub-pixel estimation accuracy.
Shifting Patterns of Deadly Violence.
ERIC Educational Resources Information Center
Seiden, Richard H.; Freitas, Raymond P.
1980-01-01
While it is true that the total suicide rates has varied little, this composite figure masks a dramatic shift in the risk of suicide by age. In recent years there has been a reduction of suicide at older ages reciprocated by an unprecedented increase of suicide and homicide at younger ages. (Author)
Multiresolution multiscale active mask segmentation of fluorescence microscope images
NASA Astrophysics Data System (ADS)
Srinivasa, Gowri; Fickus, Matthew; Kovačević, Jelena
2009-08-01
We propose an active mask segmentation framework that combines the advantages of statistical modeling, smoothing, speed and flexibility offered by the traditional methods of region-growing, multiscale, multiresolution and active contours respectively. At the crux of this framework is a paradigm shift from evolving contours in the continuous domain to evolving multiple masks in the discrete domain. Thus, the active mask framework is particularly suited to segment digital images. We demonstrate the use of the framework in practice through the segmentation of punctate patterns in fluorescence microscope images. Experiments reveal that statistical modeling helps the multiple masks converge from a random initial configuration to a meaningful one. This obviates the need for an involved initialization procedure germane to most of the traditional methods used to segment fluorescence microscope images. While we provide the mathematical details of the functions used to segment fluorescence microscope images, this is only an instantiation of the active mask framework. We suggest some other instantiations of the framework to segment different types of images.
Athermalization of infrared dual field optical system based on wavefront coding
NASA Astrophysics Data System (ADS)
Jiang, Kai; Jiang, Bo; Liu, Kai; Yan, Peipei; Duan, Jing; Shan, Qiu-sha
2017-02-01
Wavefront coding is a technology which combination of the optical design and digital image processing. By inserting a phase mask closed to the pupil plane of the optical system the wavefront of the system is re-modulated. And the depth of focus is extended consequently. In reality the idea is same as the athermalization theory of infrared optical system. In this paper, an uncooled infrared dual field optical system with effective focal as 38mm/19mm, F number as 1.2 of both focal length, operating wavelength varying from 8μm to 12μm was designed. A cubic phase mask was used at the pupil plane to re-modulate the wavefront. Then the performance of the infrared system was simulated with CODEV as the environment temperature varying from -40° to 60°. MTF curve of the optical system with phase mask are compared with the outcome before using phase mask. The result show that wavefront coding technology can make the system not sensitive to thermal defocus, and then realize the athermal design of the infrared optical system.
NASA Astrophysics Data System (ADS)
Gordon, Michael; Seiler, Theo; Carey, Joseph P.; Friedman, Marc D.; Johnsson, N. M. F.; King, Michael C.; Muller, David F.
1993-06-01
This paper reports on our progress using an erodible mask to perform photorefractive keratectomy (PRK) for the correction of myopic astigmatism. We describe modifications to the mask, the mask eye cup and the surgical microscope aimed at simplifying the procedure and improving the ergonomics of the hardware. We report the clinical results of the post-op exam for 20 patients who have undergone PRK for myopic astigmatism under a Phase IIA study. The results compare favorably with an earlier Phase IIA study for performing PRK with a computer-controlled iris. Most important, the clinical data show the absence of any significant corneal haze and no significant decrease in spectacle corrected visual acuity. Although more long term follow-up is needed, the preliminary results support the safety and effectiveness of using an erodible mask to perform PRK for myopic astigmatism.
Advanced refractory-metal and process technology for the fabrication of x-ray masks
NASA Astrophysics Data System (ADS)
Brooks, Cameron J.; Racette, Kenneth C.; Lercel, Michael J.; Powers, Lynn A.; Benoit, Douglas E.
1999-06-01
This paper provides an in-depth report of the advanced materials and process technology being developed for x-ray mask manufacturing at IBM. Masks using diamond membranes as replacement for silicon carbide are currently being fabricated. Alternate tantalum-based absorbers, such as tantalum boron, which offer improved etch resolution and critical dimension control, as well as higher x-ray absorption, are also being investigated. In addition to the absorber studies, the development of conductive chromium- based hard-mask films to replace the current silicon oxynitride layer is being explored. The progress of this advanced-materials work, which includes significant enhancements to x-ray mask image-placement performance, will be outlined.
Optimizing defect inspection strategy through the use of design-aware database control layers
NASA Astrophysics Data System (ADS)
Stoler, Dvori; Ruch, Wayne; Ma, Weimin; Chakravarty, Swapnajit; Liu, Steven; Morgan, Ray; Valadez, John; Moore, Bill; Burns, John
2007-10-01
Resolution limitations in the mask making process can cause differences between the features that appear in a database and those printed to a reticle. These differences may result from intentional or unintentional features in the database exceeding the resolution limit of the mask making process such as small gaps or lines in the data, line end shortening on small sub-resolution assist features etc creating challenges to both mask writing and mask inspection. Areas with high variance from design to mask, often referred to as high MEEF areas (mask error enhancement factor), become highly problematic and can directly impact mask and device yield, mask manufacturing cycle time and ultimately mask costs. Specific to mask inspection it may be desirable to inspect certain non-critical or non-relevant features at reduced sensitivity so as not to detect real, but less significant process defects. In contrast there may also be times where increased sensitivity is required for critical mask features or areas. Until recently, this process was extremely manual, creating added time and cost to the mask inspection cycle. Shifting to more intelligent and automated inspection flows is the key focus of this paper. A novel approach to importing design data directly into the mask inspection to include both MDP generated MRC errors files and LRC generated MEEF files. The results of recently developed inspection and review capability based upon controlling defect inspection using design aware data base control layers on a pixel basis are discussed. Typical mask shop applications and implementations will be shown.
Optimization of wavefront coding imaging system using heuristic algorithms
NASA Astrophysics Data System (ADS)
González-Amador, E.; Padilla-Vivanco, A.; Toxqui-Quitl, C.; Zermeño-Loreto, O.
2017-08-01
Wavefront Coding (WFC) systems make use of an aspheric Phase-Mask (PM) and digital image processing to extend the Depth of Field (EDoF) of computational imaging systems. For years, several kinds of PM have been designed to produce a point spread function (PSF) near defocus-invariant. In this paper, the optimization of the phase deviation parameter is done by means of genetic algorithms (GAs). In this, the merit function minimizes the mean square error (MSE) between the diffraction limited Modulated Transfer Function (MTF) and the MTF of the system that is wavefront coded with different misfocus. WFC systems were simulated using the cubic, trefoil, and 4 Zernike polynomials phase-masks. Numerical results show defocus invariance aberration in all cases. Nevertheless, the best results are obtained by using the trefoil phase-mask, because the decoded image is almost free of artifacts.
Design of wavefront coding optical system with annular aperture
NASA Astrophysics Data System (ADS)
Chen, Xinhua; Zhou, Jiankang; Shen, Weimin
2016-10-01
Wavefront coding can extend the depth of field of traditional optical system by inserting a phase mask into the pupil plane. In this paper, the point spread function (PSF) of wavefront coding system with annular aperture are analyzed. Stationary phase method and fast Fourier transform (FFT) method are used to compute the diffraction integral respectively. The OTF invariance is analyzed for the annular aperture with cubic phase mask under different obscuration ratio. With these analysis results, a wavefront coding system using Maksutov-Cassegrain configuration is designed finally. It is an F/8.21 catadioptric system with annular aperture, and its focal length is 821mm. The strength of the cubic phase mask is optimized with user-defined operand in Zemax. The Wiener filtering algorithm is used to restore the images and the numerical simulation proves the validity of the design.
Optimized phase mask to realize retro-reflection reduction for optical systems
NASA Astrophysics Data System (ADS)
He, Sifeng; Gong, Mali
2017-10-01
Aiming at the threats to the active laser detection systems of electro-optical devices due to the cat-eye effect, a novel solution is put forward to realize retro-reflection reduction in this paper. According to the demands of both cat-eye effect reduction and the image quality maintenance of electro-optical devices, a symmetric phase mask is achieved from a stationary phase method and a fast Fourier transform algorithm. Then, based on a comparison of peak normalized cross-correlation (PNCC) between the different defocus parameters, the optimal imaging position can be obtained. After modification with the designed phase mask, the cat-eye effect peak intensity can be reduced by two orders of magnitude while maintaining good image quality and high modulation transfer function (MTF). Furthermore, a practical design example is introduced to demonstrate the feasibility of our proposed approach.
Amack, Andrew J; Barber, Gary A; Ng, Patrick C; Smith, Thomas B; April, Michael D
2017-01-01
We compare received minute volume with an intraoral mask versus conventional cuffed face mask among medics obtaining a 1-handed mask seal on a cadaver model. This study comprised a randomized crossover trial of adult US Army combat medic volunteers participating in a cadaver laboratory as part of their training. We randomized participants to obtain a 1-handed mask seal during ventilation of a fresh unembalmed cadaver, first using either an intraoral airway device or conventional cuffed face mask. Participants obtained a 1-handed mask seal while a ventilator delivered 10 standardized 750-mL breaths during 1 minute. After a 5-minute rest period, they repeated the study with the alternative mask. The primary outcome measure was received minute volume as measured by a respirometer. Of 27 recruited participants, all completed the study. Median received minute volume was higher with the intraoral mask compared with conventional cuffed mask by 1.7 L (95% confidence interval 1.0 to 1.9 L; P<.001). The intraoral mask resulted in greater received minute volume received compared with conventional cuffed face mask during ventilation with a 1-handed mask seal in a cadaver model. The intraoral mask may prove a useful airway adjunct for ventilation. Copyright © 2016 American College of Emergency Physicians. Published by Elsevier Inc. All rights reserved.
Out-Phased Array Linearized Signaling (OPALS): A Practical Approach to Physical Layer Encryption
2015-10-26
Out-Phased Array Linearized Signaling ( OPALS ): A Practical Approach to Physical Layer Encryption Eric Tollefson, Bruce R. Jordan Jr., and Joseph D... OPALS ) which provides a practical approach to physical-layer encryption through spatial masking. Our approach modifies just the transmitter to employ...of the channel. With Out-Phased Array Linearized Signaling ( OPALS ), we propose a new masking technique that has some advantages of each of the
Analysis of nulling phase functions suitable to image plane coronagraphy
NASA Astrophysics Data System (ADS)
Hénault, François; Carlotti, Alexis; Vérinaud, Christophe
2016-07-01
Coronagraphy is a very efficient technique for identifying and characterizing extra-solar planets orbiting in the habitable zone of their parent star, especially in a space environment. An important family of coronagraphs is actually based on phase plates located at an intermediate image plane of the optical system, and spreading the starlight outside the "Lyot" exit pupil plane of the instrument. In this commutation we present a set of candidate phase functions generating a central null at the Lyot plane, and study how it propagates to the image plane of the coronagraph. These functions include linear azimuthal phase ramps (the well-known optical vortex), azimuthally cosine-modulated phase profiles, and circular phase gratings. Nnumerical simulations of the expected null depth, inner working angle, sensitivity to pointing errors, effect of central obscuration located at the pupil or image planes, and effective throughput including image mask and Lyot stop transmissions are presented and discussed. The preliminary conclusion is that azimuthal cosine functions appear as an interesting alternative to the classical optical vortex of integer topological charge.
Weksler, N; Tarnopolski, A; Klein, M; Schily, M; Rozentsveig, V; Shapira, A R; Gurman, G M
2005-05-01
To assess the ability of medical students to learn and retain skills of airway manipulation for insertion of the endotracheal tube, the laryngeal mask airway (Laryngeal Mask Company, Henley-on-Thames, UK) and the oesophageal-tracheal Combitube (Kendall-Sheridan Catheter Corp., Argyle, NY, USA). A 6-month prospective study was conducted among fifth-year medical students attending a 3-week clerkship in the Division of Anesthesiology and Critical Care Medicine in the Soroka Medical Center. All the students viewed a demonstration of insertion technique for the endotracheal tube, the laryngeal mask airway and the Combitube, followed by formal teaching in a mannikin. At the end of the program, the insertion skills were demonstrated in the mannikin, the success rate on the first attempt was registered and the students were requested to assess (by questionnaire) their ability to execute airway manipulation (phase 1). Six months later, the students were requested to repeat the insertion technique, and a similar re-evaluation applied (phase 2). The success rate, during the first phase, at first attempts was 100% for the laryngeal mask airway and the Combitube, compared to 57.4% for the endotracheal tube (P < 0.02), and 92.6%, 96.2% and 62.9% (P < 0.02) respectively for the second phase of the study. Learning and retention skills of medical students, in a mannikin, are more accentuated with the laryngeal mask airway and the Combitube than seen with an endotracheal tube.
ERIC Educational Resources Information Center
Leitch, Ruth
2010-01-01
Drawing on previous research identifying how teachers' capacities to sustain their effectiveness in different phases of their professional lives are affected positively and/or negatively by their sense of identity, this paper illuminates three early-mid career teachers' self-study inquiries, centring on mask work. The creative development of…
The Amygdala Is Involved in Affective Priming Effect for Fearful Faces
ERIC Educational Resources Information Center
Yang, J.; Cao, Z.; Xu, X.; Chen, G.
2012-01-01
The object of this study was to investigate whether the amygdala is involved in affective priming effect after stimuli are encoded unconsciously and consciously. During the encoding phase, each masked face (fearful or neutral) was presented to participants six times for 17 ms each, using a backward masking paradigm. During the retrieval phase,…
Effects of the inclined femto laser incidence at the phase mask on FBG carving
NASA Astrophysics Data System (ADS)
Wang, Jian; Wu, Shengli; Zhang, Jintao; Ren, Wenyi
2015-12-01
The inclined incidence of the femto laser on the phase mask in fiber Bragg grating (FBG) carving has a significant effect on the quality of FBG fabrication. Based on that the infrared femto laser has highly spatial coherence and the order walk-off will happen behind the phase mask, the interferogram generated at the fiber core by the inclined femto laser beam has been analyzed using the multi-beam interference principle. The influence of beam inclination on the coherence of the 0th and ± 1st orders diffraction with different exposure distance, the visibility of interferogram and the frequency component of the transverse interferogram intensity has also been analyzed. It is meaningful for the FBG fabricating with the femto laser.
NASA Astrophysics Data System (ADS)
Doblas, Ana; Dutta, Ananya; Saavedra, Genaro; Preza, Chrysanthe
2018-02-01
Previously, a wavefront encoded (WFE) imaging system implemented using a squared cubic (SQUBIC) phase mask has been verified to reduce the sensitivity of the imaging system to spherical aberration (SA). The strength of the SQUBIC phase mask and, as consequence, the performance of the WFE system are controlled by a design parameter, A. Although the higher the A-value, the more tolerant the WFE system is to SA, this is accomplished at the expense of the effective imaging resolution. In this contribution, we investigate this tradeoff in order to find an optimal A-value to balance the effect of SA and loss of resolution.
SEMATECH produces defect-free EUV mask blanks: defect yield and immediate challenges
NASA Astrophysics Data System (ADS)
Antohe, Alin O.; Balachandran, Dave; He, Long; Kearney, Patrick; Karumuri, Anil; Goodwin, Frank; Cummings, Kevin
2015-03-01
Availability of defect-free reflective mask has been one of the most critical challenges to extreme ultraviolet lithography (EUVL). To mitigate the risk, significant progress has been made on defect detection, pattern shifting, and defect repair. Clearly such mitigation strategies are based on the assumption that defect counts and sizes from incoming mask blanks must be below practical levels depending on mask specifics. The leading industry consensus for early mask product development is that there should be no defects greater than 80 nm in the quality area, 132 mm x 132 mm. In addition less than 10 defects smaller than 80 nm may be mitigable. SEMATECH has been focused on EUV mask blank defect reduction using Veeco Nexus TM IBD platform, the industry standard for mask blank production, and assessing if IBD technology can be evolved to a manufacturing solution. SEMATECH has recently announced a breakthrough reduction of defects in the mask blank deposition process resulting in the production of two defect-free EUV mask blanks at 54 nm inspection sensitivity (SiO2 equivalent). This paper will discuss the dramatic reduction of baseline EUV mask blank defects, review the current deposition process run and compare results with previous process runs. Likely causes of remaining defects will be discussed based on analyses as characterized by their compositions and whether defects are embedded in the multilayer stack or non-embedded.
Neural Networks For Demodulation Of Phase-Modulated Signals
NASA Technical Reports Server (NTRS)
Altes, Richard A.
1995-01-01
Hopfield neural networks proposed for demodulating quadrature phase-shift-keyed (QPSK) signals carrying digital information. Networks solve nonlinear integral equations prior demodulation circuits cannot solve. Consists of set of N operational amplifiers connected in parallel, with weighted feedback from output terminal of each amplifier to input terminals of other amplifiers. Used to solve signal processing problems. Implemented as analog very-large-scale integrated circuit that achieves rapid convergence. Alternatively, implemented as digital simulation of such circuit. Also used to improve phase estimation performance over that of phase-locked loop.
Modulation of Polarization for Phase Extraction in Holographic Interferometry with Two References
NASA Astrophysics Data System (ADS)
Rodriguez-Zurita, G.; Vázquez-Castillo, J.-F.; Toto-Arellano, N.-I.; Meneses-Fabian, C.; Jiménez-Montero, L.-E.
2010-04-01
Heterodyne holographic interferometry allows high accuracy for phase-difference extraction between two wave fronts, especially when they are previously recorded in the same recording medium. In part, this is because the wave fronts can be affected by the recording process in a very similar way. The double reconstruction of a double-exposure hologram with two independent references results in a two-beam holographic interferometer with an arm conveying a wave modulated in frequency when using heterodyne techniques. The heterodyne frequency has been usually introduced with a plane mirror attached to a piezo-electric stack driven with a suitable variable power supply. For holographic interferometry, however, less attention has been devoted to alternative phase retrieval variants as, for example, phase-shifting with modulation of polarization or Fourier methods. In this work, we propose and demonstrate the basic capabilities of modulation of polarization performing as a phase-shifting technique for holographic interferometry with two references in a phase-stepping scheme. Experimental results are provided.
What Happens to Therapists Who Work with Sex Offenders?
ERIC Educational Resources Information Center
Farrenkopf, Toni
1992-01-01
Surveyed 24 experienced therapists working with sex offenders regarding personal impact of work. Most reported shift in perspective, becoming discouraged about client change. Several adjustment phases were reported. One-quarter experienced burnout. Alternative to burnout was adaptation: lowering of expectations, objective detachment, acceptance of…
Skin Temperature Rhythms in Humans Respond to Changes in the Timing of Sleep and Light.
Cuesta, Marc; Boudreau, Philippe; Cermakian, Nicolas; Boivin, Diane B
2017-06-01
Body temperature is known to vary with circadian phase and to be influenced by factors that can mask its circadian expression. We wanted to test whether skin temperature rhythms were sensitive to an abrupt shift of the sleep schedule and to the resetting effects of light. Nineteen healthy subjects spent 6 days in time isolation and underwent a simulated night-shift procedure. They were assigned to either a control group ( n = 10) or bright light group ( n = 9) and measurements were taken under a baseline day-oriented schedule and during the 4 th cycle of a night-oriented schedule. In the bright light group, participants were exposed to a 3-cycle 8-h exposure of ~6,500 lux at night, while the control group remained in dim light conditions (~3 lux). Skin temperature was recorded in 10 and 4 participants from the control and bright light groups, respectively. We found significant circadian rhythms of plasma melatonin, core body temperature (CBT), and skin temperature at baseline for both groups ( p < 0.001 for all). Rhythms of melatonin, CBT, and skin temperature following night shifts were significantly phase delayed by about 7 to 9 h ( p < 0.05) in response to bright light at night, whereas there was no shift in the control group. In addition, we found that at bedtime melatonin does not consistently increase before the increase in distal skin temperature and subsequent decrease in CBT, in contrast to what has been previously reported. The present study shows that, in constant posture conditions, skin temperature rhythms have an evoked component sensitive to abrupt changes in the timing of sleep. They also comprise an endogenous component that is sensitive to the resetting effects of bright light exposure. These results have applications for the determination of circadian phase, as skin temperature is less intrusive than rectal temperature recordings.
A cluster randomised trial of cloth masks compared with medical masks in healthcare workers.
MacIntyre, C Raina; Seale, Holly; Dung, Tham Chi; Hien, Nguyen Tran; Nga, Phan Thi; Chughtai, Abrar Ahmad; Rahman, Bayzidur; Dwyer, Dominic E; Wang, Quanyi
2015-04-22
The aim of this study was to compare the efficacy of cloth masks to medical masks in hospital healthcare workers (HCWs). The null hypothesis is that there is no difference between medical masks and cloth masks. 14 secondary-level/tertiary-level hospitals in Hanoi, Vietnam. 1607 hospital HCWs aged ≥18 years working full-time in selected high-risk wards. Hospital wards were randomised to: medical masks, cloth masks or a control group (usual practice, which included mask wearing). Participants used the mask on every shift for 4 consecutive weeks. Clinical respiratory illness (CRI), influenza-like illness (ILI) and laboratory-confirmed respiratory virus infection. The rates of all infection outcomes were highest in the cloth mask arm, with the rate of ILI statistically significantly higher in the cloth mask arm (relative risk (RR)=13.00, 95% CI 1.69 to 100.07) compared with the medical mask arm. Cloth masks also had significantly higher rates of ILI compared with the control arm. An analysis by mask use showed ILI (RR=6.64, 95% CI 1.45 to 28.65) and laboratory-confirmed virus (RR=1.72, 95% CI 1.01 to 2.94) were significantly higher in the cloth masks group compared with the medical masks group. Penetration of cloth masks by particles was almost 97% and medical masks 44%. This study is the first RCT of cloth masks, and the results caution against the use of cloth masks. This is an important finding to inform occupational health and safety. Moisture retention, reuse of cloth masks and poor filtration may result in increased risk of infection. Further research is needed to inform the widespread use of cloth masks globally. However, as a precautionary measure, cloth masks should not be recommended for HCWs, particularly in high-risk situations, and guidelines need to be updated. Australian New Zealand Clinical Trials Registry: ACTRN12610000887077. Published by the BMJ Publishing Group Limited. For permission to use (where not already granted under a licence) please go to http://group.bmj.com/group/rights-licensing/permissions.
PHASE DIFFERENTIAL INDICATING CIRCUIT
Kirsten, F.A.
1962-01-01
An electronic circuit for totalizing the net phase difference between two alternating current signals is designed which responds to both increasing and decreasing phase changes. A phase comparator provldes an output pulse for each 360 deg of phase difference occurring, there being a negative pulse for phase shtft in one direction and a positive pulse for a phase shift in the opposite direction. A counting circuit utilizing glow discharge tubes receives the negative and positive pulses at a single input terminal and provides a running net total, pulses of one polarity dded and pulses of the opposite polarity being subtracted. The glow discharge tubes may be decaded to increase the total count capacity. (AEC)
Lensless digital holography with diffuse illumination through a pseudo-random phase mask.
Bernet, Stefan; Harm, Walter; Jesacher, Alexander; Ritsch-Marte, Monika
2011-12-05
Microscopic imaging with a setup consisting of a pseudo-random phase mask, and an open CMOS camera, without an imaging objective, is demonstrated. The pseudo random phase mask acts as a diffuser for an incoming laser beam, scattering a speckle pattern to a CMOS chip, which is recorded once as a reference. A sample which is afterwards inserted somewhere in the optical beam path changes the speckle pattern. A single (non-iterative) image processing step, comparing the modified speckle pattern with the previously recorded one, generates a sharp image of the sample. After a first calibration the method works in real-time and allows quantitative imaging of complex (amplitude and phase) samples in an extended three-dimensional volume. Since no lenses are used, the method is free from lens abberations. Compared to standard inline holography the diffuse sample illumination improves the axial sectioning capability by increasing the effective numerical aperture in the illumination path, and it suppresses the undesired so-called twin images. For demonstration, a high resolution spatial light modulator (SLM) is programmed to act as the pseudo-random phase mask. We show experimental results, imaging microscopic biological samples, e.g. insects, within an extended volume at a distance of 15 cm with a transverse and longitudinal resolution of about 60 μm and 400 μm, respectively.
NASA Astrophysics Data System (ADS)
Singh, Hukum
2016-12-01
A cryptosystem for securing image encryption is considered by using double random phase encoding in Fresnel wavelet transform (FWT) domain. Random phase masks (RPMs) and structured phase masks (SPMs) based on devil's vortex toroidal lens (DVTL) are used in spatial as well as in Fourier planes. The images to be encrypted are first Fresnel transformed and then single-level discrete wavelet transform (DWT) is apply to decompose LL,HL, LH and HH matrices. The resulting matrices from the DWT are multiplied by additional RPMs and the resultants are subjected to inverse DWT for the encrypted images. The scheme is more secure because of many parameters used in the construction of SPM. The original images are recovered by using the correct parameters of FWT and SPM. Phase mask SPM based on DVTL increases security that enlarges the key space for encryption and decryption. The proposed encryption scheme is a lens-less optical system and its digital implementation has been performed using MATLAB 7.6.0 (R2008a). The computed value of mean-squared-error between the retrieved and the input images shows the efficacy of scheme. The sensitivity to encryption parameters, robustness against occlusion, entropy and multiplicative Gaussian noise attacks have been analysed.
Spatial shaping for generating arbitrary optical dipole traps for ultracold degenerate gases
DOE Office of Scientific and Technical Information (OSTI.GOV)
Lee, Jeffrey G., E-mail: jglee@umd.edu; Institute for Physical Science and Technology, University of Maryland, College Park, Maryland 20742; Hill, W. T., E-mail: wth@umd.edu
2014-10-15
We present two spatial-shaping approaches – phase and amplitude – for creating two-dimensional optical dipole potentials for ultracold neutral atoms. When combined with an attractive or repulsive Gaussian sheet formed by an astigmatically focused beam, atoms are trapped in three dimensions resulting in planar confinement with an arbitrary network of potentials – a free-space atom chip. The first approach utilizes an adaptation of the generalized phase-contrast technique to convert a phase structure embedded in a beam after traversing a phase mask, to an identical intensity profile in the image plane. Phase masks, and a requisite phase-contrast filter, can be chemicallymore » etched into optical material (e.g., fused silica) or implemented with spatial light modulators; etching provides the highest quality while spatial light modulators enable prototyping and realtime structure modification. This approach was demonstrated on an ensemble of thermal atoms. Amplitude shaping is possible when the potential structure is made as an opaque mask in the path of a dipole trap beam, followed by imaging the shadow onto the plane of the atoms. While much more lossy, this very simple and inexpensive approach can produce dipole potentials suitable for containing degenerate gases. High-quality amplitude masks can be produced with standard photolithography techniques. Amplitude shaping was demonstrated on a Bose-Einstein condensate.« less
Reentrant processing mediates object substitution masking: comment on Põder (2013).
Di Lollo, Vincent
2014-01-01
Object-substitution masking (OSM) occurs when a target stimulus and a surrounding mask are displayed briefly together, and the display then continues with the mask alone. Target identification is accurate when the stimuli co-terminate but is progressively impaired as the duration of the trailing mask is increased. In reentrant accounts, OSM is said to arise from iterative exchanges between brain regions connected by two-way pathways. In an alternative account, OSM is explained on the basis of exclusively feed-forward processes, without recourse to reentry. Here I show that the feed-forward account runs afoul of the extant phenomenological, behavioral, brain-imaging, and electrophysiological evidence. Further, the feed-forward assumption that masking occurs when attention finds a degraded target is shown to be entirely ad hoc. In contrast, the evidence is uniformly consistent with a reentrant-processing account of OSM.
Inspection of imprint lithography patterns for semiconductor and patterned media
NASA Astrophysics Data System (ADS)
Resnick, Douglas J.; Haase, Gaddi; Singh, Lovejeet; Curran, David; Schmid, Gerard M.; Luo, Kang; Brooks, Cindy; Selinidis, Kosta; Fretwell, John; Sreenivasan, S. V.
2010-03-01
Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Acceptance of imprint lithography for manufacturing will require demonstration that it can attain defect levels commensurate with the requirements of cost-effective device production. This work summarizes the results of defect inspections of semiconductor masks, wafers and hard disks patterned using Jet and Flash Imprint Lithography (J-FILTM). Inspections were performed with optical and e-beam based automated inspection tools. For the semiconductor market, a test mask was designed which included dense features (with half pitches ranging between 32 nm and 48 nm) containing an extensive array of programmed defects. For this work, both e-beam inspection and optical inspection were used to detect both random defects and the programmed defects. Analytical SEMs were then used to review the defects detected by the inspection. Defect trends over the course of many wafers were observed with another test mask using a KLA-T 2132 optical inspection tool. The primary source of defects over 2000 imprints were particle related. For the hard drive market, it is important to understand the defectivity of both the template and the imprinted disk. This work presents a methodology for automated pattern inspection and defect classification for imprint-patterned media. Candela CS20 and 6120 tools from KLA-Tencor map the optical properties of the disk surface, producing highresolution grayscale images of surface reflectivity, scattered light, phase shift, etc. Defects that have been identified in this manner are further characterized according to the morphology
Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance
NASA Astrophysics Data System (ADS)
Dietze, Uwe; Dress, Peter; Waehler, Tobias; Singh, Sherjang; Jonckheere, Rik; Baudemprez, Bart
2011-03-01
Extreme Ultraviolet Lithography (EUVL) is considered the leading lithography technology choice for semiconductor devices at 16nm HP node and beyond. However, before EUV Lithography can enter into High Volume Manufacturing (HVM) of advanced semiconductor devices, the ability to guarantee mask integrity at point-of-exposure must be established. Highly efficient, damage free mask cleaning plays a critical role during the mask manufacturing cycle and throughout the life of the mask, where the absence of a pellicle to protect the EUV mask increases the risk of contamination during storage, handling and use. In this paper, we will present effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance, which employs an intelligent, holistic approach to maximize Mean Time Between Cleans (MBTC) and extend the useful life span of the reticle. The data presented will demonstrate the protection of the capping and absorber layers, preservation of pattern integrity as well as optical and mechanical properties to avoid unpredictable CD-linewidth and overlay shifts. Experiments were performed on EUV blanks and pattern masks using various process conditions. Conditions showing high particle removal efficiency (PRE) and minimum surface layer impact were then selected for durability studies. Surface layer impact was evaluated over multiple cleaning cycles by means of UV reflectivity metrology XPS analysis and wafer prints. Experimental results were compared to computational models. Mask life time predictions where made using the same computational models. The paper will provide a generic overview of the cleaning sequence which yielded best results, but will also provide recommendations for an efficient in-fab mask maintenance scheme, addressing handling, storage, cleaning and inspection.
Joint optimization of source, mask, and pupil in optical lithography
NASA Astrophysics Data System (ADS)
Li, Jia; Lam, Edmund Y.
2014-03-01
Mask topography effects need to be taken into consideration for more advanced resolution enhancement techniques in optical lithography. However, rigorous 3D mask model achieves high accuracy at a large computational cost. This work develops a combined source, mask and pupil optimization (SMPO) approach by taking advantage of the fact that pupil phase manipulation is capable of partially compensating for mask topography effects. We first design the pupil wavefront function by incorporating primary and secondary spherical aberration through the coefficients of the Zernike polynomials, and achieve optimal source-mask pair under the condition of aberrated pupil. Evaluations against conventional source mask optimization (SMO) without incorporating pupil aberrations show that SMPO provides improved performance in terms of pattern fidelity and process window sizes.
NASA Astrophysics Data System (ADS)
Feng, Bin; Shi, Zelin; Zhang, Chengshuo; Xu, Baoshu; Zhang, Xiaodong
2016-05-01
The point spread function (PSF) inconsistency caused by temperature variation leads to artifacts in decoded images of a wavefront coding infrared imaging system. Therefore, this paper proposes an analytical model for the effect of temperature variation on the PSF consistency. In the proposed model, a formula for the thermal deformation of an optical phase mask is derived. This formula indicates that a cubic optical phase mask (CPM) is still cubic after thermal deformation. A proposed equivalent cubic phase mask (E-CPM) is a virtual and room-temperature lens which characterizes the optical effect of temperature variation on the CPM. Additionally, a calculating method for PSF consistency after temperature variation is presented. Numerical simulation illustrates the validity of the proposed model and some significant conclusions are drawn. Given the form parameter, the PSF consistency achieved by a Ge-material CPM is better than the PSF consistency by a ZnSe-material CPM. The effect of the optical phase mask on PSF inconsistency is much slighter than that of the auxiliary lens group. A large form parameter of the CPM will introduce large defocus-insensitive aberrations, which improves the PSF consistency but degrades the room-temperature MTF.
Survey geometry and the internal consistency of recent cosmic shear measurements
NASA Astrophysics Data System (ADS)
Troxel, M. A.; Krause, E.; Chang, C.; Eifler, T. F.; Friedrich, O.; Gruen, D.; MacCrann, N.; Chen, A.; Davis, C.; DeRose, J.; Dodelson, S.; Gatti, M.; Hoyle, B.; Huterer, D.; Jarvis, M.; Lacasa, F.; Lemos, P.; Peiris, H. V.; Prat, J.; Samuroff, S.; Sánchez, C.; Sheldon, E.; Vielzeuf, P.; Wang, M.; Zuntz, J.; Lahav, O.; Abdalla, F. B.; Allam, S.; Annis, J.; Avila, S.; Bertin, E.; Brooks, D.; Burke, D. L.; Rosell, A. Carnero; Kind, M. Carrasco; Carretero, J.; Crocce, M.; Cunha, C. E.; D'Andrea, C. B.; da Costa, L. N.; De Vicente, J.; Diehl, H. T.; Doel, P.; Evrard, A. E.; Flaugher, B.; Fosalba, P.; Frieman, J.; García-Bellido, J.; Gaztanaga, E.; Gerdes, D. W.; Gruendl, R. A.; Gschwend, J.; Gutierrez, G.; Hartley, W. G.; Hollowood, D. L.; Honscheid, K.; James, D. J.; Kirk, D.; Kuehn, K.; Kuropatkin, N.; Li, T. S.; Lima, M.; March, M.; Menanteau, F.; Miquel, R.; Mohr, J. J.; Ogando, R. L. C.; Plazas, A. A.; Roodman, A.; Sanchez, E.; Scarpine, V.; Schindler, R.; Sevilla-Noarbe, I.; Smith, M.; Soares-Santos, M.; Sobreira, F.; Suchyta, E.; Swanson, M. E. C.; Thomas, D.; Walker, A. R.; Wechsler, R. H.
2018-06-01
We explore the impact of an update to the typical approximation for the shape noise term in the analytic covariance matrix for cosmic shear experiments that assumes the absence of survey boundary and mask effects. We present an exact expression for the number of galaxy pairs in this term based on the survey mask, which leads to more than a factor of three increase in the shape noise on the largest measured scales for the Kilo-Degree Survey (KIDS-450) real-space cosmic shear data. We compare the result of this analytic expression to several alternative methods for measuring the shape noise from the data and find excellent agreement. This update to the covariance resolves any internal model tension evidenced by the previously large cosmological best-fit χ2 for the KiDS-450 cosmic shear data. The best-fit χ2 is reduced from 161 to 121 for 118 degrees of freedom. We also apply a correction to how the multiplicative shear calibration uncertainty is included in the covariance. This change shifts the inferred amplitude of the correlation function to higher values. We find that this improves agreement of the KiDS-450 cosmic shear results with Dark Energy Survey Year 1 and Planck results.
Effects of non-simultaneous masking on the binaural masking level difference
Buss, Emily; Hall III, Joseph W.
2011-01-01
The present study sought to clarify the role of non-simultaneous masking in the binaural masking level difference for maskers that fluctuate in level. In the first experiment the signal was a brief 500-Hz tone, and the masker was a bandpass noise (100–2000 Hz), with the initial and final 200-ms bursts presented at 40-dB spectrum level and the inter-burst gap presented at 20-dB spectrum level. Temporal windows were fitted to thresholds measured for a range of gap durations and signal positions within the gap. In the second experiment, individual differences in out of phase (NoSπ) thresholds were compared for a brief signal in a gapped bandpass masker, a brief signal in a steady bandpass masker, and a long signal in a narrowband (50-Hz-wide) noise masker. The third experiment measured brief tone detection thresholds in forward, simultaneous, and backward masking conditions for a 50- and for a 1900-Hz-wide noise masker centered on the 500-Hz signal frequency. Results are consistent with comparable temporal resolution in the in phase (NoSo) and NoSπ conditions and no effect of temporal resolution on individual observers’ ability to utilize binaural cues in narrowband noise. The large masking release observed for a narrowband noise masker may be due to binaural masking release from non-simultaneous, informational masking. PMID:21361448
Achromatic Focal Plane Mask for Exoplanet Imaging Coronagraphy
NASA Technical Reports Server (NTRS)
Newman, Kevin Edward; Belikov, Ruslan; Guyon, Olivier; Balasubramanian, Kunjithapatham; Wilson, Dan
2013-01-01
Recent advances in coronagraph technologies for exoplanet imaging have achieved contrasts close to 1e10 at 4 lambda/D and 1e-9 at 2 lambda/D in monochromatic light. A remaining technological challenge is to achieve high contrast in broadband light; a challenge that is largely limited by chromaticity of the focal plane mask. The size of a star image scales linearly with wavelength. Focal plane masks are typically the same size at all wavelengths, and must be sized for the longest wavelength in the observational band to avoid starlight leakage. However, this oversized mask blocks useful discovery space from the shorter wavelengths. We present here the design, development, and testing of an achromatic focal plane mask based on the concept of optical filtering by a diffractive optical element (DOE). The mask consists of an array of DOE cells, the combination of which functions as a wavelength filter with any desired amplitude and phase transmission. The effective size of the mask scales nearly linearly with wavelength, and allows significant improvement in the inner working angle of the coronagraph at shorter wavelengths. The design is applicable to almost any coronagraph configuration, and enables operation in a wider band of wavelengths than would otherwise be possible. We include initial results from a laboratory demonstration of the mask with the Phase Induced Amplitude Apodization coronagraph.
Applying time-frequency analysis to assess cerebral autoregulation during hypercapnia.
Placek, Michał M; Wachel, Paweł; Iskander, D Robert; Smielewski, Peter; Uryga, Agnieszka; Mielczarek, Arkadiusz; Szczepański, Tomasz A; Kasprowicz, Magdalena
2017-01-01
Classic methods for assessing cerebral autoregulation involve a transfer function analysis performed using the Fourier transform to quantify relationship between fluctuations in arterial blood pressure (ABP) and cerebral blood flow velocity (CBFV). This approach usually assumes the signals and the system to be stationary. Such an presumption is restrictive and may lead to unreliable results. The aim of this study is to present an alternative method that accounts for intrinsic non-stationarity of cerebral autoregulation and the signals used for its assessment. Continuous recording of CBFV, ABP, ECG, and end-tidal CO2 were performed in 50 young volunteers during normocapnia and hypercapnia. Hypercapnia served as a surrogate of the cerebral autoregulation impairment. Fluctuations in ABP, CBFV, and phase shift between them were tested for stationarity using sphericity based test. The Zhao-Atlas-Marks distribution was utilized to estimate the time-frequency coherence (TFCoh) and phase shift (TFPS) between ABP and CBFV in three frequency ranges: 0.02-0.07 Hz (VLF), 0.07-0.20 Hz (LF), and 0.20-0.35 Hz (HF). TFPS was estimated in regions locally validated by statistically justified value of TFCoh. The comparison of TFPS with spectral phase shift determined using transfer function approach was performed. The hypothesis of stationarity for ABP and CBFV fluctuations and the phase shift was rejected. Reduced TFPS was associated with hypercapnia in the VLF and the LF but not in the HF. Spectral phase shift was also decreased during hypercapnia in the VLF and the LF but increased in the HF. Time-frequency method led to lower dispersion of phase estimates than the spectral method, mainly during normocapnia in the VLF and the LF. The time-frequency method performed no worse than the classic one and yet may offer benefits from lower dispersion of phase shift as well as a more in-depth insight into the dynamic nature of cerebral autoregulation.
Fielden, Claire A; Kluk, Karolina; McKay, Colette M
2013-06-01
This experiment investigated whether place specificity of neural activity evoked by cochlear implant stimulation is improved in tripolar compared to monopolar mode using a forward masking protocol addressing some limitations of previous methods of measurement and analysis. The amount of residual masking (masking remaining at long masker-probe delays) was also measured, and its potential influence on the specificity measures was evaluated. The masker stimulus comprised equally loud interleaved mono- or tripolar stimulation on two electrodes equidistant from a central probe electrode in an apical and basal direction, reducing the influence of off-site listening. The effect of masker-probe distance on the threshold shift of the tripolar probe was analyzed to derive a measure of place specificity. On average, tripolar maskers were more place specific than monopolar maskers, although the mean effect was small. There was no significant effect of masker level on specificity or on the differences observed between modes. The mean influence of residual masking on normalized masking functions was similar for the two modes and, therefore, did not influence the comparison of specificity between the modes. However, variability in amount of residual masking was observed between subjects, and therefore should be considered in forward masking studies that compare place specificity across subjects.
Masking release by combined spatial and masker-fluctuation effects in the open sound field.
Middlebrooks, John C
2017-12-01
In a complex auditory scene, signals of interest can be distinguished from masking sounds by differences in source location [spatial release from masking (SRM)] and by differences between masker-alone and masker-plus-signal envelopes. This study investigated interactions between those factors in release of masking of 700-Hz tones in an open sound field. Signal and masker sources were colocated in front of the listener, or the signal source was shifted 90° to the side. In Experiment 1, the masker contained a 25-Hz-wide on-signal band plus flanking bands having envelopes that were either mutually uncorrelated or were comodulated. Comodulation masking release (CMR) was largely independent of signal location at a higher masker sound level, but at a lower level CMR was reduced for the lateral signal location. In Experiment 2, a brief signal was positioned at the envelope maximum (peak) or minimum (dip) of a 50-Hz-wide on-signal masker. Masking was released in dip more than in peak conditions only for the 90° signal. Overall, open-field SRM was greater in magnitude than binaural masking release reported in comparable closed-field studies, and envelope-related release was somewhat weaker. Mutual enhancement of masking release by spatial and envelope-related effects tended to increase with increasing masker level.
Design of an integrated aerial image sensor
NASA Astrophysics Data System (ADS)
Xue, Jing; Spanos, Costas J.
2005-05-01
The subject of this paper is a novel integrated aerial image sensor (IAIS) system suitable for integration within the surface of an autonomous test wafer. The IAIS could be used as a lithography processing monitor, affording a "wafer's eye view" of the process, and therefore facilitating advanced process control and diagnostics without integrating (and dedicating) the sensor to the processing equipment. The IAIS is composed of an aperture mask and an array of photo-detectors. In order to retrieve nanometer scale resolution of the aerial image with a practical photo-detector pixel size, we propose a design of an aperture mask involving a series of spatial phase "moving" aperture groups. We demonstrate a design example aimed at the 65nm technology node through TEMPEST simulation. The optimized, key design parameters include an aperture width in the range of 30nm, aperture thickness in the range of 70nm, and offer a spatial resolution of about 5nm, all with comfortable fabrication tolerances. Our preliminary simulation work indicates the possibility of the IAIS being applied to the immersion lithography. A bench-top far-field experiment verifies that our approach of the spatial frequency down-shift through forming large Moire patterns is feasible.
Kishimoto, Keiko; Hasaka, Akiko; Yamaura, Katsunori; Fukushima, Noriko
2016-01-01
Pharmacy is required to shift toward human service such as hearing the complaints of health. But the study about help-seeking behavior to pharmacist is not really investigated. We hypothesized that a decrease in expression visibility, due to pharmacists' typical masks, may negatively impact help-seeker' trust in pharmacist. The sample included 100 drugstore customers aged ≥18 years. Participants were stratified by gender and randomly assigned to two groups: evaluation of clear-masked and normal-masked pharmacists. After viewing a video with either male or female pharmacists wearing either clear or normal masks, participants completed a questionnaire. The primary outcome was trust in pharmacist measured by the Trust Scale and the secondary outcome was impression of the pharmacist measured by nineteen pairs of adjectives. There were no differences by gender on trust scores. Results revealed that both male and female pharmacists who wore clear masks were rated as more trustworthy than normal-masked pharmacists (p<0.001, d=0.903, and p=0.001, d=0.716, respectively). Sixteen of nineteen adjectives reported for pharmacists wearing normal masks indicated greater negative intention than those with clear masks (d=0.431-1.469). In most cases, among pharmacists wearing clear masks, results showed positive correlations between trust and each impression adjective (r=0.279-0.710). Our findings indicate that pharmacists wearing normal masks, which partially hide facial expressions, may decrease customer's trust in pharmacist. Further, normal masks were associated with negative impression. To avoid the inhibition of help-seek behavior, we recommend that pharmacists wear a clear mask and increase non-verbal communication.
Advanced repair solution of clear defects on HTPSM by using nanomachining tool
NASA Astrophysics Data System (ADS)
Lee, Hyemi; Kim, Munsik; Jung, Hoyong; Kim, Sangpyo; Yim, Donggyu
2015-10-01
As the mask specifications become tighter for low k1 lithography, more aggressive repair accuracy is required below sub 20nm tech. node. To meet tight defect specifications, many maskshops select effective repair tools according to defect types. Normally, pattern defects are repaired by the e-beam repair tool and soft defects such as particles are repaired by the nanomachining tool. It is difficult for an e-beam repair tool to remove particle defects because it uses chemical reaction between gas and electron, and a nanomachining tool, which uses physical reaction between a nano-tip and defects, cannot be applied for repairing clear defects. Generally, film deposition process is widely used for repairing clear defects. However, the deposited film has weak cleaning durability, so it is easily removed by accumulated cleaning process. Although the deposited film is strongly attached on MoSiN(or Qz) film, the adhesive strength between deposited Cr film and MoSiN(or Qz) film becomes weaker and weaker by the accumulated energy when masks are exposed in a scanner tool due to the different coefficient of thermal expansion of each materials. Therefore, whenever a re-pellicle process is needed to a mask, all deposited repair points have to be confirmed whether those deposition film are damaged or not. And if a deposition point is damaged, repair process is needed again. This process causes longer and more complex process. In this paper, the basic theory and the principle are introduced to recover clear defects by using nanomachining tool, and the evaluated results are reviewed at dense line (L/S) patterns and contact hole (C/H) patterns. Also, the results using a nanomachining were compared with those using an e-beam repair tool, including the cleaning durability evaluated by the accumulated cleaning process. Besides, we discuss the phase shift issue and the solution about the image placement error caused by phase error.
Human Adolescent Phase Response Curves to Bright White Light.
Crowley, Stephanie J; Eastman, Charmane I
2017-08-01
Older adolescents are particularly vulnerable to circadian misalignment and sleep restriction, primarily due to early school start times. Light can shift the circadian system and could help attenuate circadian misalignment; however, a phase response curve (PRC) to determine the optimal time for receiving light and avoiding light is not available for adolescents. We constructed light PRCs for late pubertal to postpubertal adolescents aged 14 to 17 years. Participants completed 2 counterbalanced 5-day laboratory sessions after 8 or 9 days of scheduled sleep at home. Each session included phase assessments to measure the dim light melatonin onset (DLMO) before and after 3 days of free-running through an ultradian light-dark (wake-sleep) cycle (2 h dim [~20 lux] light, 2 h dark). In one session, intermittent bright white light (~5000 lux; four 20-min exposures) was alternated with 10 min of dim room light once per day for 3 consecutive days. The time of light varied among participants to cover the 24-h day. For each individual, the phase shift to bright light was corrected for the free-run derived from the other laboratory session with no bright light. One PRC showed phase shifts in response to light start time relative to the DLMO and another relative to home sleep. Phase delay shifts occurred around the hours corresponding to home bedtime. Phase advances occurred during the hours surrounding wake time and later in the afternoon. The transition from delays to advances occurred at the midpoint of home sleep. The adolescent PRCs presented here provide a valuable tool to time bright light in adolescents.
Modulation cues influence binaural masking-level difference in masking-pattern experiments.
Nitschmann, Marc; Verhey, Jesko L
2012-03-01
Binaural masking patterns show a steep decrease in the binaural masking-level difference (BMLD) when masker and signal have no frequency component in common. Experimental threshold data are presented together with model simulations for a diotic masker centered at 250 or 500 Hz and a bandwidth of 10 or 100 Hz masking a sinusoid interaurally in phase (S(0)) or in antiphase (S(π)). Simulations with a binaural model, including a modulation filterbank for the monaural analysis, indicate that a large portion of the decrease in the BMLD in remote-masking conditions may be due to an additional modulation cue available for monaural detection. © 2012 Acoustical Society of America
High Contrast Internal and External Coronagraph Masks Produced by Various Techniques
NASA Technical Reports Server (NTRS)
Balasubramanian, Kunjithapatha; Wilson, Daniel; White, Victor; Muller, Richard; Dickie, Matthew; Yee, Karl; Ruiz, Ronald; Shaklan, Stuart; Cady, Eric; Kern, Brian;
2013-01-01
Masks for high contrast internal and external coronagraphic imaging require a variety of masks depending on different architectures to suppress star light. Various fabrication technologies are required to address a wide range of needs including gradient amplitude transmission, tunable phase profiles, ultra-low reflectivity, precise small scale features, and low-chromaticity. We present the approaches employed at JPL to produce pupil plane and image plane coronagraph masks, and lab-scale external occulter type masks by various techniques including electron beam, ion beam, deep reactive ion etching, and black silicon technologies with illustrative examples of each. Further development is in progress to produce circular masks of various kinds for obscured aperture telescopes.
Masked response priming in expert typists.
Heinemann, Alexander; Kiesel, Andrea; Pohl, Carsten; Kunde, Wilfried
2010-03-01
In masked priming tasks responses are usually faster when prime and target require identical rather than different responses. Previous research has extensively manipulated the nature and number of response-affording stimuli. However, little is known about the constraints of masked priming regarding the nature and number of response alternatives. The present study explored the limits of masked priming in a six-choice reaction time task, where responses from different fingers of both hands were required. We studied participants that were either experts for the type of response (skilled typists) or novices. Masked primes facilitated responding to targets that required the same response, responses with a different finger of the same hand, and with a homologous finger of the other hand. These effects were modulated by expertise. The results show that masked primes facilitate responding especially for experts in the S-R mapping and with increasing similarity of primed and required response.
Masking release for words in amplitude-modulated noise as a function of modulation rate and task
Buss, Emily; Whittle, Lisa N.; Grose, John H.; Hall, Joseph W.
2009-01-01
For normal-hearing listeners, masked speech recognition can improve with the introduction of masker amplitude modulation. The present experiments tested the hypothesis that this masking release is due in part to an interaction between the temporal distribution of cues necessary to perform the task and the probability of those cues temporally coinciding with masker modulation minima. Stimuli were monosyllabic words masked by speech-shaped noise, and masker modulation was introduced via multiplication with a raised sinusoid of 2.5–40 Hz. Tasks included detection, three-alternative forced-choice identification, and open-set identification. Overall, there was more masking release associated with the closed than the open-set tasks. The best rate of modulation also differed as a function of task; whereas low modulation rates were associated with best performance for the detection and three-alternative identification tasks, performance improved with modulation rate in the open-set task. This task-by-rate interaction was also observed when amplitude-modulated speech was presented in a steady masker, and for low- and high-pass filtered speech presented in modulated noise. These results were interpreted as showing that the optimal rate of amplitude modulation depends on the temporal distribution of speech cues and the information required to perform a particular task. PMID:19603883
Phase-field simulations of GaN growth by selective area epitaxy on complex mask geometries
Aagesen, Larry K.; Coltrin, Michael Elliott; Han, Jung; ...
2015-05-15
Three-dimensional phase-field simulations of GaN growth by selective area epitaxy were performed. Furthermore, this model includes a crystallographic-orientation-dependent deposition rate and arbitrarily complex mask geometries. The orientation-dependent deposition rate can be determined from experimental measurements of the relative growth rates of low-index crystallographic facets. Growth on various complex mask geometries was simulated on both c-plane and a-plane template layers. Agreement was observed between simulations and experiment, including complex phenomena occurring at the intersections between facets. The sources of the discrepancies between simulated and experimental morphologies were also investigated. We found that the model provides a route to optimize masks andmore » processing conditions during materials synthesis for solar cells, light-emitting diodes, and other electronic and opto-electronic applications.« less
Zhang, Lijia; Liu, Bo; Xin, Xiangjun
2015-06-15
A secure optical generalized filter bank multi-carrier (GFBMC) system with carrier-less amplitude-phase (CAP) modulation is proposed in this Letter. The security is realized through cubic constellation-masked method. Large key space and more flexibility masking can be obtained by cubic constellation masking aligning with the filter bank. An experiment of 18 Gb/s encrypted GFBMC/CAP system with 25-km single-mode fiber transmission is performed to demonstrate the feasibility of the proposed method.
High-contrast coronagraph performance in the presence of focal plane mask defects
NASA Astrophysics Data System (ADS)
Sidick, Erkin; Shaklan, Stuart; Balasubramanian, Kunjithapatham; Cady, Eric
2014-08-01
We have carried out a study of the performance of high-contrast coronagraphs in the presence of mask defects. We have considered the effects of opaque and dielectric particles of various dimensions, as well as systematic mask fabrication errors and the limitations of material properties in creating dark holes. We employ sequential deformable mirrors to compensate for phase and amplitude errors, and show the limitations of this approach in the presence of coronagraph image-mask defects.
Schallom, Marilyn; Cracchiolo, Lisa; Falker, Antoinette; Foster, Jennifer; Hager, JoAnn; Morehouse, Tamara; Watts, Peggy; Weems, Linda; Kollef, Marin
2015-07-01
Device-related pressure ulcers from noninvasive ventilation masks alter skin integrity and cause patients discomfort. To examine the incidence, location, and stage of pressure ulcers and patients' comfort with a nasal-oral mask compared with a full-face mask. A before-after study of a convenience sample of patients with noninvasive ventilation orders in 5 intensive care units was conducted. Two groups of 100 patients each received either the nasal-oral mask or the full-face mask. Skin was assessed before the mask was applied and every 12 hours after that or upon mask removal. Comfort levels were assessed every 12 hours on a Likert scale of 1 to 5 (1, most comfortable). A pressure ulcer developed in 20% of patients in the nasal-oral mask group and 2% of patients in the full-face mask group (P < .001). Comfort scores were significantly lower (more comfortable) with the full-face mask (mean [SD], 1.9 [1.1]) than with the nasal-oral mask (mean [SD], 2.7 [1.2], P < .001). Neither mean hours worn nor percentage adherence differed significantly: 28.9 (SD, 27.2) hours and 92% for full-face mask and 25 (SD, 20.7) and 92% for nasal-oral mask. No patients who had a pressure ulcer develop with the nasal-oral mask had a pressure ulcer develop with the full-face mask. The full-face mask resulted in significantly fewer pressure ulcers and was more comfortable for patients. The full-face mask is a reasonable alternative to traditional nasal-oral masks for patients receiving noninvasive ventilation. ©2015 American Association of Critical-Care Nurses.
Ricker, Timothy J; Sandry, Joshua
2018-04-10
The presentation of a similar but irrelevant stimulus immediately following presentation of a memory item is called masking. Masking is known to reduce performance on working memory tests. This is the type of memory used to hold information in mind for brief periods of time for use in ongoing cognition. Two approaches to understanding masking effects have been proposed in different literatures. Working memory researchers often assume that the reduction in working memory performance after masking is because masking interferes with a transient sensory representation that is needed to complete consolidation into a working memory state. Researchers focused on the attentional blink, a finding that attention cannot be directed to new stimuli during working memory consolidation, have an alternative theory. Attentional blink researchers assume that masking slows the short-term consolidation process, thereby extending the length of the attentional blink. In two experiments, we contrast these two approaches to explaining masking effects and investigate the validity of both hypotheses. Some aspects of both approaches are validated, but neither theoretical perspective alone sufficiently explains the entire pattern of results. © 2018 New York Academy of Sciences.
Application of the phase extension method in virus crystallography.
Reddy, Vijay S
2016-01-01
The procedure for phase extension (PX) involves gradually extending the initial phases from low resolution (e.g., ~8Å) to the high-resolution limit of a diffraction data set. Structural redundancy present in the viral capsids that display icosahedral symmetry results in a high degree of non-crystallographic symmetry (NCS), which in turn translates into higher phasing power and is critical for improving and extending phases to higher resolution. Greater completeness of the diffraction data and determination of a molecular replacement solution, which entails accurately identifying the virus particle orientation(s) and position(s), are important for the smooth progression of the PX procedure. In addition, proper definition of a molecular mask (envelope) around the NCS-asymmetric unit has been found to be important for the success of density modification procedures, such as density averaging and solvent flattening. Regardless of the degree of NCS, the PX method appears to work well in all space groups, provided an accurate molecular mask is used along with reasonable initial phases. However, in the cases with space group P1, in addition to requiring a molecular mask, starting the phase extension at a higher resolution (e.g., 6Å) overcame the previously reported problems due to Babinet phases and phase flipping errors.
Evaluation of a new pediatric positive airway pressure mask.
Kushida, Clete A; Halbower, Ann C; Kryger, Meir H; Pelayo, Rafael; Assalone, Valerie; Cardell, Chia-Yu; Huston, Stephanie; Willes, Leslee; Wimms, Alison J; Mendoza, June
2014-09-15
The choice and variety of pediatric masks for continuous positive airway pressure (CPAP) is limited in the US. Therefore, clinicians often prescribe modified adult masks. Until recently a mask for children aged < 7 years was not available. This study evaluated apnea-hypopnea index (AHI) equivalence and acceptability of a new pediatric CPAP mask for children aged 2-7 years (Pixi; ResMed Ltd, Sydney, Australia). Patients aged 2-7 years were enrolled and underwent in-lab baseline polysomnography (PSG) using their previous mask, then used their previous mask and the VPAP III ST-A flow generator for ≥ 10 nights at home. Thereafter, patients switched to the Pixi mask for ≥ 2 nights before returning for a PSG during PAP therapy via the Pixi mask. Patients then used the Pixi mask at home for ≥ 21 nights. Patients and their parents/guardians returned to the clinic for follow-up and provided feedback on the Pixi mask versus their previous mask. AHI with the Pixi mask was 1.1 ± 1.5/h vs 2.6 ± 5.4/h with the previous mask (p = 0.3538). Parents rated the Pixi mask positively for: restfulness of the child's sleep, trouble in getting the child to sleep, and trouble in having the child stay asleep. The Pixi mask was also rated highly for leaving fewer or no marks on the upper lip and under the child's ears, and being easy to remove. The Pixi mask is suitable for children aged 2-7 years and provides an alternative to other masks available for PAP therapy in this age group. © 2014 American Academy of Sleep Medicine.
Tuning the cognitive environment: Sound masking with 'natural' sounds in open-plan offices
NASA Astrophysics Data System (ADS)
DeLoach, Alana
With the gain in popularity of open-plan office design and the engineering efforts to achieve acoustical comfort for building occupants, a majority of workers still report dissatisfaction in their workplace environment. Office acoustics influence organizational effectiveness, efficiency, and satisfaction through meeting appropriate requirements for speech privacy and ambient sound levels. Implementing a sound masking system is one tried-and-true method of achieving privacy goals. Although each sound masking system is tuned for its specific environment, the signal -- random steady state electronic noise, has remained the same for decades. This research work explores how `natural' sounds may be used as an alternative to this standard masking signal employed so ubiquitously in sound masking systems in the contemporary office environment. As an unobtrusive background sound, possessing the appropriate spectral characteristics, this proposed use of `natural' sounds for masking challenges the convention that masking sounds should be as meaningless as possible. Through the pilot study presented in this work, we hypothesize that `natural' sounds as sound maskers will be as effective at masking distracting background noise as the conventional masking sound, will enhance cognitive functioning, and increase participant (worker) satisfaction.
Effect of Masking on Subjective Responses to Daily Disposable Contact Lenses.
Keir, Nancy; Luensmann, Doerte; Woods, Craig A; Bergenske, Peter; Fahmy, Mary; Fonn, Desmond
2016-08-01
To explore the effect of masking on subjective responses when wearing daily disposable (DD) contact lenses. In an adaptation phase, habitual wearers of Manufacturer-A (MFA) (n = 43) and Manufacturer-B (MFB) (n = 53) wore MFA-brand 1 or MFB-brand 1 DDs, respectively, for 30 days, open-label. Subjects were then randomly assigned to one of two experiments. Each experiment included two, 3-day crossover phases. An enhanced version of MFA and MFB lenses (MFA-brand 2 and MFB-brand 2) were worn contralaterally to evaluate potential differences in masking result between manufacturers. Experiment 1: subjects were fully masked to lens and packaging (FM) then unmasked (UM). Experiment 2: subjects were FM then partially masked using an over-label (PM). Comfort ratings (0-100) were recorded for each lens daily and preference between lenses was recorded on day 3 for each crossover phase. The mean difference between 0-100 ratings or preference when FM or PM versus UM for the same lens was considered a measurement of the effect associated with masking. The purpose of the study was withheld from subjects to minimize bias. The effect associated with masking for habitual wearers of MFA and MFB lenses was less than 1 out of 100 (0 ± 2.5) in both experiments. Fifty-eight subjects (60%) expressed no preference when FM. This decreased to 29 (30%) when UM or PM (proportion test, p < 0.001). Approximately half the subjects had a change in lens preference when they were UM or PM, primarily in favor of their habitual lens manufacturer. Masking did not have a measurable impact on 0-100 ratings with the DD lenses used in this study but did have an impact on lens preference. Subjects were more likely to express a preference when they handled the lenses and were exposed to the lens packaging and, in some cases, able to read the lens brand and lens manufacturer.
ERIC Educational Resources Information Center
Holder, Katharina; Kessels, Ursula
2017-01-01
Teacher judgments of student performance might be biased by stereotypes, which can result in disadvantages for members of negatively stereotyped social groups. On the basis of the shifting standards theory, we examined gender and ethnic biases in student teachers' judgments. According to this theory, whether such judgment biases are masked or…
Method for maintaining precise suction strip porosities
NASA Technical Reports Server (NTRS)
Gallimore, Frank H. (Inventor)
1989-01-01
This invention relates to a masking method generally and, more particularly to a method of masking perforated titanium sheets having laminar control suction strips. As illustrated in the drawings, a nonaerodynamic surface of a perforated sheet has alternating suction strip areas and bonding land areas. Suction strip tapes overlie the bonding land areas during application of a masking material to an upper surface of the suction strip tapes. Prior to bonding the perforated sheet to a composite structure, the bonding land tapes are removed. The entire opposite aerodynamic surface is masked with tape before bonding. This invention provides a precise control of suction strip porosities by ensuring that no chemicals penetrate the suction strip areas during bonding.
Mukerji, Shohini; MacIntyre, C Raina; Newall, Anthony T
2015-10-13
There has been increasing debate surrounding mask and respirator interventions to control respiratory infection transmission in both healthcare and community settings. As decision makers are considering the recommendations they should evaluate how to provide the most efficient protection strategies with minimum costs. The aim of this review is to identify and evaluate the existing economic evaluation literature in this area and to offer advice on how future evaluations on this topic should be conducted. We searched the Scopus database for all literature on economic evaluation of mask or respirator use to control respiratory infection transmission. Reference lists from the identified studies were also manually searched. Seven studies met our inclusion criteria from the initial 806 studies identified by the search strategy and our manual search. Five studies considered interventions for seasonal and/or pandemic influenza, with one also considering SARS (Severe Acute Respiratory Syndrome). The other two studies focussed on tuberculosis transmission control interventions. The settings and methodologies of the studies varied greatly. No low-middle income settings were identified. Only one of the reviewed studies cited clinical evidence to inform their mask/respirator intervention effectiveness parameters. Mask and respirator interventions were generally reported by the study authors to be cost saving or cost-effective when compared to no intervention or other control measures, however the evaluations had important limitations. Given the large cost differential between masks and respirators, there is a need for more comprehensive economic evaluations to compare the relative costs and benefits of these interventions in situations and settings where alternative options are potentially applicable. There are at present insufficient well conducted cost-effectiveness studies to inform decision-makers on the value for money of alternative mask/respirator options.
Holographically Encoded Volume Phase Masks
2015-07-13
Lu et al., “Coherent beam combination of fiber laser arrays via multiplexed volume Bragg gratings,” in Conf. on Lasers and Electro- Optics: Science...combining of fiber lasers using multiplexed volume Bragg gratings,” in Conf. on Lasers and Electro- Optics: Science and Innovations, OSA Technical Digest...satisfying the Bragg condition of the hologram. Moreover, this approach enables the capability to encode and multiplex several phase masks into a single
Point spread function engineering for iris recognition system design.
Ashok, Amit; Neifeld, Mark A
2010-04-01
Undersampling in the detector array degrades the performance of iris-recognition imaging systems. We find that an undersampling of 8 x 8 reduces the iris-recognition performance by nearly a factor of 4 (on CASIA iris database), as measured by the false rejection ratio (FRR) metric. We employ optical point spread function (PSF) engineering via a Zernike phase mask in conjunction with multiple subpixel shifted image measurements (frames) to mitigate the effect of undersampling. A task-specific optimization framework is used to engineer the optical PSF and optimize the postprocessing parameters to minimize the FRR. The optimized Zernike phase enhanced lens (ZPEL) imager design with one frame yields an improvement of nearly 33% relative to a thin observation module by bounded optics (TOMBO) imager with one frame. With four frames the optimized ZPEL imager achieves a FRR equal to that of the conventional imager without undersampling. Further, the ZPEL imager design using 16 frames yields a FRR that is actually 15% lower than that obtained with the conventional imager without undersampling.
NASA Astrophysics Data System (ADS)
Lu, Dajiang; He, Wenqi; Liao, Meihua; Peng, Xiang
2017-02-01
A new method to eliminate the security risk of the well-known interference-based optical cryptosystem is proposed. In this method, which is suitable for security authentication application, two phase-only masks are separately placed at different distances from the output plane, where a certification image (public image) can be obtained. To further increase the security and flexibility of this authentication system, we employ one more validation image (secret image), which can be observed at another output plane, for confirming the identity of the user. Only if the two correct masks are properly settled at their positions one could obtain two significant images. Besides, even if the legal users exchange their masks (keys), the authentication process will fail and the authentication results will not reveal any information. Numerical simulations are performed to demonstrate the validity and security of the proposed method.
NASA Astrophysics Data System (ADS)
He, A.; Quan, C.
2018-04-01
The principal component analysis (PCA) and region matching combined method is effective for fringe direction estimation. However, its mask construction algorithm for region matching fails in some circumstances, and the algorithm for conversion of orientation to direction in mask areas is computationally-heavy and non-optimized. We propose an improved PCA based region matching method for the fringe direction estimation, which includes an improved and robust mask construction scheme, and a fast and optimized orientation-direction conversion algorithm for the mask areas. Along with the estimated fringe direction map, filtered fringe pattern by automatic selective reconstruction modification and enhanced fast empirical mode decomposition (ASRm-EFEMD) is used for Hilbert spiral transform (HST) to demodulate the phase. Subsequently, windowed Fourier ridge (WFR) method is used for the refinement of the phase. The robustness and effectiveness of proposed method are demonstrated by both simulated and experimental fringe patterns.
Orthogonal polynomials for refinable linear functionals
NASA Astrophysics Data System (ADS)
Laurie, Dirk; de Villiers, Johan
2006-12-01
A refinable linear functional is one that can be expressed as a convex combination and defined by a finite number of mask coefficients of certain stretched and shifted replicas of itself. The notion generalizes an integral weighted by a refinable function. The key to calculating a Gaussian quadrature formula for such a functional is to find the three-term recursion coefficients for the polynomials orthogonal with respect to that functional. We show how to obtain the recursion coefficients by using only the mask coefficients, and without the aid of modified moments. Our result implies the existence of the corresponding refinable functional whenever the mask coefficients are nonnegative, even when the same mask does not define a refinable function. The algorithm requires O(n^2) rational operations and, thus, can in principle deliver exact results. Numerical evidence suggests that it is also effective in floating-point arithmetic.
A phase response curve to single bright light pulses in human subjects
NASA Technical Reports Server (NTRS)
Khalsa, Sat Bir S.; Jewett, Megan E.; Cajochen, Christian; Czeisler, Charles A.
2003-01-01
The circadian pacemaker is differentially sensitive to the resetting effects of retinal light exposure, depending upon the circadian phase at which the light exposure occurs. Previously reported human phase response curves (PRCs) to single bright light exposures have employed small sample sizes, and were often based on relatively imprecise estimates of circadian phase and phase resetting. In the present study, 21 healthy, entrained subjects underwent pre- and post-stimulus constant routines (CRs) in dim light (approximately 2-7 lx) with maintained wakefulness in a semi-recumbent posture. The 6.7 h bright light exposure stimulus consisted of alternating 6 min fixed gaze (approximately 10 000 lx) and free gaze (approximately 5000-9000 lx) exposures. Light exposures were scheduled across the circadian cycle in different subjects so as to derive a PRC. Plasma melatonin was used to determine the phase of the onset, offset, and midpoint of the melatonin profiles during the CRs. Phase shifts were calculated as the difference in phase between the pre- and post-stimulus CRs. The resultant PRC of the midpoint of the melatonin rhythm revealed a characteristic type 1 PRC with a significant peak-to-trough amplitude of 5.02 h. Phase delays occurred when the light stimulus was centred prior to the critical phase at the core body temperature minimum, phase advances occurred when the light stimulus was centred after the critical phase, and no phase shift occurred at the critical phase. During the subjective day, no prolonged 'dead zone' of photic insensitivity was apparent. Phase shifts derived using the melatonin onsets showed larger magnitudes than those derived from the melatonin offsets. These data provide a comprehensive characterization of the human PRC under highly controlled laboratory conditions.
Tryggestad, Erik; Christian, Matthew; Ford, Eric; Kut, Carmen; Le, Yi; Sanguineti, Giuseppe; Song, Danny Y; Kleinberg, Lawrence
2011-05-01
To determine whether frameless thermoplastic mask-based immobilization is adequate for image-guided cranial radiosurgery. Cone-beam CT localization data from patients with intracranial tumors were studied using daily pre- and posttreatment scans. The systems studied were (1) Type-S IMRT (head only) mask (Civco) with head cushion; (2) Uni-Frame mask (Civco) with head cushion, coupled with a BlueBag body immobilizer (Medical Intelligence); (3) Type-S head and shoulder mask with head and shoulder cushion (Civco); (4) same as previous, coupled with a mouthpiece. The comparative metrics were translational shift magnitude and average rotation angle; systematic inter-, random inter-, and random intrafraction positioning error was computed. For strategies 1-4, respectively, the analysis for interfraction variability included data from 20, 9, 81, and 11 patients, whereas that for intrafraction variability included a subset of 7, 9, 16, and 8 patients. The results were compared for statistical significance using an analysis of variance test. Immobilization system 4 provided the best overall accuracy and stability. The mean interfraction translational shifts (± SD) were 2.3 (± 1.4), 2.2 (± 1.1), 2.7 (± 1.5), and 2.1 (± 1.0) mm whereas intrafraction motion was 1.1 (± 1.2), 1.1 (± 1.1), 0.7 (± 0.9), and 0.7 (± 0.8) mm for devices 1-4, respectively. No significant correlation between intrafraction motion and treatment time was evident, although intrafraction motion was not purely random. We find that all frameless thermoplastic mask systems studied are viable solutions for image-guided intracranial radiosurgery. With daily pretreatment corrections, symmetric PTV margins of 1 mm would likely be adequate if ideal radiation planning and targeting systems were available. Copyright © 2011 Elsevier Inc. All rights reserved.
NASA Astrophysics Data System (ADS)
Rafiq Abuturab, Muhammad
2018-01-01
A new asymmetric multiple information cryptosystem based on chaotic spiral phase mask (CSPM) and random spectrum decomposition is put forwarded. In the proposed system, each channel of secret color image is first modulated with a CSPM and then gyrator transformed. The gyrator spectrum is randomly divided into two complex-valued masks. The same procedure is applied to multiple secret images to get their corresponding first and second complex-valued masks. Finally, first and second masks of each channel are independently added to produce first and second complex ciphertexts, respectively. The main feature of the proposed method is the different secret images encrypted by different CSPMs using different parameters as the sensitive decryption/private keys which are completely unknown to unauthorized users. Consequently, the proposed system would be resistant to potential attacks. Moreover, the CSPMs are easier to position in the decoding process owing to their own centering mark on axis focal ring. The retrieved secret images are free from cross-talk noise effects. The decryption process can be implemented by optical experiment. Numerical simulation results demonstrate the viability and security of the proposed method.
Spectral masking of goethite in abandoned mine drainage systems: implications for Mars
Cull, Selby; Cravotta, Charles A.; Klinges, Julia Grace; Weeks, Chloe
2014-01-01
Remote sensing studies of the surface of Mars use visible- to near-infrared (VNIR) spectroscopy to identify hydrated and hydroxylated minerals, which can be used to constrain past environmental conditions on the surface of Mars. However, due to differences in optical properties, some hydrated phases can mask others in VNIR spectra, complicating environmental interpretations. Here, we examine the role of masking in VNIR spectra of natural precipitates of ferrihydrite, schwertmannite, and goethite from abandoned mine drainage (AMD) systems in southeastern Pennsylvania. Mixtures of ferrihydrite, schwertmannite, and goethite were identified in four AMD sites by using X-ray diffractometry (XRD), and their XRD patterns compared to their VNIR spectra. We find that both ferrihydrite and schwertmannite can mask goethite in VNIR spectra of natural AMD precipitates. These findings suggest that care should be taken in interpreting environments on Mars where ferrihydrite, schwertmannite, or goethite are found, as the former two may be masking the latter. Additionally, our findings suggest that outcrops on Mars with both goethite and ferrihydrite/schwertmannite VNIR signatures may have high relative abundances of goethite, or the goethite may exist in a coarsely crystalline phase.
Emoto, Akira; Fukuda, Takashi
2013-02-20
For Fourier transform holography, an effective random phase distribution with randomly displaced phase segments is proposed for obtaining a smooth finite optical intensity distribution in the Fourier transform plane. Since unitary phase segments are randomly distributed in-plane, the blanks give various spatial frequency components to an image, and thus smooth the spectrum. Moreover, by randomly changing the phase segment size, spike generation from the unitary phase segment size in the spectrum can be reduced significantly. As a result, a smooth spectrum including sidebands can be formed at a relatively narrow extent. The proposed phase distribution sustains the primary functions of a random phase mask for holographic-data recording and reconstruction. Therefore, this distribution is expected to find applications in high-density holographic memory systems, replacing conventional random phase mask patterns.
Extending CO2 cryogenic aerosol cleaning for advanced optical and EUV mask cleaning
NASA Astrophysics Data System (ADS)
Varghese, Ivin; Bowers, Charles W.; Balooch, Mehdi
2011-11-01
Cryogenic CO2 aerosol cleaning being a dry, chemically-inert and residue-free process is used in the production of optical lithography masks. It is an attractive cleaning option for the mask industry to achieve the requirement for removal of all printable soft defects and repair debris down to the 50nm printability specification. In the technique, CO2 clusters are formed by sudden expansion of liquid from high to almost atmospheric pressure through an optimally designed nozzle orifice. They are then directed on to the soft defects or debris for momentum transfer and subsequent damage free removal from the mask substrate. Unlike aggressive acid based wet cleaning, there is no degradation of the mask after processing with CO2, i.e., no critical dimension (CD) change, no transmission/phase losses, or chemical residue that leads to haze formation. Therefore no restriction on number of cleaning cycles is required to be imposed, unlike other cleaning methods. CO2 aerosol cleaning has been implemented for several years as full mask final clean in production environments at several state of the art mask shops. Over the last two years our group reported successful removal of all soft defects without damage to the fragile SRAF features, zero adders (from the cleaning and handling mechanisms) down to a 50nm printability specification. In addition, CO2 aerosol cleaning is being utilized to remove debris from Post-RAVE repair of hard defects in order to achieve the goal of no printable defects. It is expected that CO2 aerosol cleaning can be extended to extreme ultraviolet (EUV) masks. In this paper, we report advances being made in nozzle design qualification for optimum snow properties (size, velocity and flux) using Phase Doppler Anemometry (PDA) technique. In addition the two new areas of focus for CO2 aerosol cleaning i.e. pellicle glue residue removal on optical masks, and ruthenium (Ru) film on EUV masks are presented. Usually, the residue left over after the pellicle has been removed from returned masks (after long term usage/exposure in the wafer fab), requires a very aggressive SPM wet clean, that drastically reduces the available budget for mask properties (CD, phase/transmission). We show that CO2aerosol cleaning can be utilized to remove the bulk of the glue residue effectively, while preserving the mask properties. This application required a differently designed nozzle to impart the required removal force for the sticky glue residue. A new nozzle was developed and qualified that resulted in PRE in the range of 92-98%. Results also include data on a patterned mask that was exposed in a lithography stepper in a wafer production environment. On EUV mask, our group has experimentally demonstrated that 50 CO2 cleaning cycles of Ru film on the EUV Front-side resulted in no appreciable reflectivity change, implying that no degradation of the Ru film occurs.
Van-Buendia, Lan B; Allely, Rebekah R; Lassiter, Ronald; Weinand, Christian; Jordan, Marion H; Jeng, James C
2010-01-01
Clinically, the initial blanching in burn scar seen on transparent plastic face mask application seems to diminish with time and movement requiring mask alteration. To date, studies quantifying perfusion with prolonged mask use do not exist. This study used laser Doppler imaging (LDI) to assess perfusion through the transparent face mask and movement in subjects with and without burn over time. Five subjects fitted with transparent face masks were scanned with the LDI on four occasions. The four subjects without burn were scanned in the following manner: 1) no mask, 2) mask on while at rest, 3) mask on with alternating intervals of sustained facial expression and rest, and 4) after mask removal. Images were acquired every 3 minutes throughout the 85-minute study period. The subject with burn underwent a shortened scanning protocol to increase comfort. Each face was divided into five regions of interest for analysis. Compared with baseline, mask application decreased perfusion significantly in all subjects (P < .0001). Perfusion did not change during the rest period. There were no significant differences with changing facial expression in any of the regions of interest. On mask removal, all regions of the face demonstrated a hyperemic effect with the chin (P = .05) and each cheek (P < .0001) reaching statistical significance. Perfusion levels did not return to baseline in the chin and cheeks after 30 minutes of mask removal. Perfusions remain constantly low while wearing the face mask, despite changing facial expressions. Changing facial expressions with the mask on did not alter perfusion. Hyperemic response occurs on removal of the mask. This study exposed methodology and statistical issues worth considering when conducting future research with the face, pressure therapy, and with LDI technology.
NASA Astrophysics Data System (ADS)
Grobnic, D.; Mihailov, S. J.; Ding, H.; Bilodeau, F.; Smelser, C. W.
2006-05-01
Multimode sapphire fibre Bragg gratings (SFBG) made with an ultrafast Ti:sapphire 800 nm laser and a phase mask were probed using a tapered single mode fibre of different taper diameters to produce single and low order mode reflection/transmission responses. A configuration made of an input single mode tapered fibre and multimode silica fibre used for output coupling was also tested and has delivered a filtered multimode transmission spectrum. The tapered coupling improved the spectral resolution of the SFBG. Such improvements facilitate the utilization of the SFBG as a high temperature sensor. Wavelength shifts of the single mode response were monitored as a function of temperature up to 1500 °C with no detectable degradation in the grating strength or hysteresis in the Bragg resonance.
Optical digital chaos cryptography
NASA Astrophysics Data System (ADS)
Arenas-Pingarrón, Álvaro; González-Marcos, Ana P.; Rivas-Moscoso, José M.; Martín-Pereda, José A.
2007-10-01
In this work we present a new way to mask the data in a one-user communication system when direct sequence - code division multiple access (DS-CDMA) techniques are used. The code is generated by a digital chaotic generator, originally proposed by us and previously reported for a chaos cryptographic system. It is demonstrated that if the user's data signal is encoded with a bipolar phase-shift keying (BPSK) technique, usual in DS-CDMA, it can be easily recovered from a time-frequency domain representation. To avoid this situation, a new system is presented in which a previous dispersive stage is applied to the data signal. A time-frequency domain analysis is performed, and the devices required at the transmitter and receiver end, both user-independent, are presented for the optical domain.
Aging human circadian rhythms: conventional wisdom may not always be right
NASA Technical Reports Server (NTRS)
Monk, Timothy H.
2005-01-01
This review discusses the ways in which the circadian rhythms of older people are different from those of younger adults. After a brief discussion of clinical issues, the review describes the conventional wisdom regarding age-related changes in circadian rhythms. These can be summarized as four assertions regarding what happens to people as they get older: 1) the amplitude of their circadian rhythms reduces, 2) the phase of their circadian rhythms becomes earlier, 3) their natural free-running period (tau) shortens, and 4) their ability to tolerate abrupt phase shifts (e.g., from jet travel or night work) worsens. The review then discusses the empirical evidence for and against these assertions and discusses some alternative explanations. The conclusions are that although older people undoubtedly have earlier circadian phases than younger adults, and have more trouble coping with shift work and jet lag, evidence for the assertions about rhythm amplitude and tau are, at best, mixed.
Epp, Bastian; Yasin, Ifat; Verhey, Jesko L
2013-12-01
The audibility of important sounds is often hampered due to the presence of other masking sounds. The present study investigates if a correlate of the audibility of a tone masked by noise is found in late auditory evoked potentials measured from human listeners. The audibility of the target sound at a fixed physical intensity is varied by introducing auditory cues of (i) interaural target signal phase disparity and (ii) coherent masker level fluctuations in different frequency regions. In agreement with previous studies, psychoacoustical experiments showed that both stimulus manipulations result in a masking release (i: binaural masking level difference; ii: comodulation masking release) compared to a condition where those cues are not present. Late auditory evoked potentials (N1, P2) were recorded for the stimuli at a constant masker level, but different signal levels within the same set of listeners who participated in the psychoacoustical experiment. The data indicate differences in N1 and P2 between stimuli with and without interaural phase disparities. However, differences for stimuli with and without coherent masker modulation were only found for P2, i.e., only P2 is sensitive to the increase in audibility, irrespective of the cue that caused the masking release. The amplitude of P2 is consistent with the psychoacoustical finding of an addition of the masking releases when both cues are present. Even though it cannot be concluded where along the auditory pathway the audibility is represented, the P2 component of auditory evoked potentials is a candidate for an objective measure of audibility in the human auditory system. Copyright © 2013 Elsevier B.V. All rights reserved.
Adaptive color halftoning for minimum perceived error using the blue noise mask
NASA Astrophysics Data System (ADS)
Yu, Qing; Parker, Kevin J.
1997-04-01
Color halftoning using a conventional screen requires careful selection of screen angles to avoid Moire patterns. An obvious advantage of halftoning using a blue noise mask (BNM) is that there are no conventional screen angle or Moire patterns produced. However, a simple strategy of employing the same BNM on all color planes is unacceptable in case where a small registration error can cause objectionable color shifts. In a previous paper by Yao and Parker, strategies were presented for shifting or inverting the BNM as well as using mutually exclusive BNMs for different color planes. In this paper, the above schemes will be studied in CIE-LAB color space in terms of root mean square error and variance for luminance channel and chrominance channel respectively. We will demonstrate that the dot-on-dot scheme results in minimum chrominance error, but maximum luminance error and the 4-mask scheme results in minimum luminance error but maximum chrominance error, while the shift scheme falls in between. Based on this study, we proposed a new adaptive color halftoning algorithm that takes colorimetric color reproduction into account by applying 2-mutually exclusive BNMs on two different color planes and applying an adaptive scheme on other planes to reduce color error. We will show that by having one adaptive color channel, we obtain increased flexibility to manipulate the output so as to reduce colorimetric error while permitting customization to specific printing hardware.
Seismic Masking of an Underground Nuclear Explosion
1973-10-31
At this point in the analysis the existence of the Lgl phase (Ewing Jardetzky. and Press. 1957. p.219; Richter. 1958. p. 267; Bath . 1973. P- 76...These ve ocities are taken from the discussion by Bath who goes on to say that the ^ Phase in the records of continental earthquakes at short...the microzone of the masked explosion, but excluded from further study 1. 21 February 1963 CARMEL 2. 12 February 1965 ALPACA Reason for
Dharmadhikari, Ashwin S; Mphahlele, Matsie; Stoltz, Anton; Venter, Kobus; Mathebula, Rirhandzu; Masotla, Thabiso; Lubbe, Willem; Pagano, Marcello; First, Melvin; Jensen, Paul A; van der Walt, Martie; Nardell, Edward A
2012-05-15
Drug-resistant tuberculosis transmission in hospitals threatens staff and patient health. Surgical face masks used by patients with tuberculosis (TB) are believed to reduce transmission but have not been rigorously tested. We sought to quantify the efficacy of surgical face masks when worn by patients with multidrug-resistant TB (MDR-TB). Over 3 months, 17 patients with pulmonary MDR-TB occupied an MDR-TB ward in South Africa and wore face masks on alternate days. Ward air was exhausted to two identical chambers, each housing 90 pathogen-free guinea pigs that breathed ward air either when patients wore surgical face masks (intervention group) or when patients did not wear masks (control group). Efficacy was based on differences in guinea pig infections in each chamber. Sixty-nine of 90 control guinea pigs (76.6%; 95% confidence interval [CI], 68-85%) became infected, compared with 36 of 90 intervention guinea pigs (40%; 95% CI, 31-51%), representing a 56% (95% CI, 33-70.5%) decreased risk of TB transmission when patients used masks. Surgical face masks on patients with MDR-TB significantly reduced transmission and offer an adjunct measure for reducing TB transmission from infectious patients.
Vortex via process: analysis and mask fabrication for contact CDs <80 nm
NASA Astrophysics Data System (ADS)
Levenson, Marc D.; Tan, Sze M.; Dai, Grace; Morikawa, Yasutaka; Hayashi, Naoya; Ebihara, Takeaki
2003-06-01
In an optical vortex, the wavefront spirals like a corkscrew, rather than forming planes or spheres. Since any nonzero optical amplitude must have a well-defined phase, the axis of a vortex is always dark. Printed in negative resist at 248nm and NA=0.63, 250nm pitch vortex arrays would produce contact holes with 80nm
Teo, Ming; Amis, Terence; Lee, Sharon; Falland, Karina; Lambert, Stephen; Wheatley, John
2011-07-01
Continuous positive airway pressure (CPAP) titration studies are commonly performed using a nasal mask but some patients may prefer a full-face or oronasal mask. There is little evidence regarding the equivalence of different mask interfaces used to initiate treatment. We hypothesized that oronasal breathing when using an oronasal mask increases upper airway collapsibility and that a higher pressure may be required to maintain airway patency. We also assessed patient preferences for the 2 mask interfaces. Prospective, randomized, cross-over design with 2 consecutive CPAP titration nights. Accredited laboratory in a university hospital. Twenty-four treatment-naive subjects with obstructive sleep apnea syndrome and respiratory disturbance index of greater than 15 events per hour. CPAP titration was performed using an auto-titrating machine with randomization to a nasal or oronasal mask, followed by a second titration night using the alternate mask style. There was no significant difference in the mean pressures determined between nasal and oronasal masks, although 43% of subjects had nasal-to-oronasal mask-pressure differences of 2 cm H(2)O or more. Residual respiratory events, arousals, and measured leak were all greater with the oronasal mask. Seventy-nine percent of subjects preferred the nasal mask. Patients with obstructive sleep apnea syndrome can generally switch between nasal and oronasal masks without changing machine pressure, although there are individual differences that may be clinically significant. Measured leak is greater with the oronasal mask. Most patients with obstructive sleep apnea syndrome prefer a nasal mask as the interface for initiation of CPAP. Australian New Zealand Clinical Trials Registry (ANZCTR). ACTRN: ACTRN12611000243910. URL: http://www.ANZCTR.org.au/ACTRN12611000243910.aspx
Evaluation of a New Pediatric Positive Airway Pressure Mask
Kushida, Clete A.; Halbower, Ann C.; Kryger, Meir H.; Pelayo, Rafael; Assalone, Valerie; Cardell, Chia-Yu; Huston, Stephanie; Willes, Leslee; Wimms, Alison J.; Mendoza, June
2014-01-01
Study Objectives: The choice and variety of pediatric masks for continuous positive airway pressure (CPAP) is limited in the US. Therefore, clinicians often prescribe modified adult masks. Until recently a mask for children aged < 7 years was not available. This study evaluated apnea-hypopnea index (AHI) equivalence and acceptability of a new pediatric CPAP mask for children aged 2-7 years (Pixi; ResMed Ltd, Sydney, Australia). Methods: Patients aged 2-7 years were enrolled and underwent in-lab baseline polysomnography (PSG) using their previous mask, then used their previous mask and the VPAP III ST-A flow generator for ≥ 10 nights at home. Thereafter, patients switched to the Pixi mask for ≥ 2 nights before returning for a PSG during PAP therapy via the Pixi mask. Patients then used the Pixi mask at home for ≥ 21 nights. Patients and their parents/guardians returned to the clinic for follow-up and provided feedback on the Pixi mask versus their previous mask. Results: AHI with the Pixi mask was 1.1 ± 1.5/h vs 2.6 ± 5.4/h with the previous mask (p = 0.3538). Parents rated the Pixi mask positively for: restfulness of the child's sleep, trouble in getting the child to sleep, and trouble in having the child stay asleep. The Pixi mask was also rated highly for leaving fewer or no marks on the upper lip and under the child's ears, and being easy to remove. Conclusions: The Pixi mask is suitable for children aged 2-7 years and provides an alternative to other masks available for PAP therapy in this age group. Citation: Kushida CA, Halbower AC, Kryger MH, Pelayo R, Assalone V, Cardell CY, Huston S, Willes L, Wimms AJ, Mendoza J. Evaluation of a new pediatric positive airway pressure mask. J Clin Sleep Med 2014;10(9):979-984. PMID:25142768
Inverse lithography using sparse mask representations
NASA Astrophysics Data System (ADS)
Ionescu, Radu C.; Hurley, Paul; Apostol, Stefan
2015-03-01
We present a novel optimisation algorithm for inverse lithography, based on optimization of the mask derivative, a domain inherently sparse, and for rectilinear polygons, invertible. The method is first developed assuming a point light source, and then extended to general incoherent sources. What results is a fast algorithm, producing manufacturable masks (the search space is constrained to rectilinear polygons), and flexible (specific constraints such as minimal line widths can be imposed). One inherent trick is to treat polygons as continuous entities, thus making aerial image calculation extremely fast and accurate. Requirements for mask manufacturability can be integrated in the optimization without too much added complexity. We also explain how to extend the scheme for phase-changing mask optimization.
Improved Phase-Mask Fabrication of Fiber Bragg Gratings
NASA Technical Reports Server (NTRS)
Grant, Joseph; Wang, Ying; Sharma, Anup
2004-01-01
An improved method of fabrication of Bragg gratings in optical fibers combines the best features of two prior methods: one that involves the use of a phase mask and one that involves interference between the two coherent laser beams. The improved method affords flexibility for tailoring Bragg wavelengths and bandwidths over wide ranges. A Bragg grating in an optical fiber is a periodic longitudinal variation in the index of refraction of the fiber core. The spatial period (Bragg wavelength) is chosen to obtain enhanced reflection of light of a given wavelength that would otherwise propagate relatively unimpeded along the core. Optionally, the spatial period of the index modulation can be made to vary gradually along the grating (such a grating is said to be chirped ) in order to obtain enhanced reflection across a wavelength band, the width of which is determined by the difference between the maximum and minimum Bragg wavelengths. In the present method as in both prior methods, a Bragg grating is formed by exposing an optical fiber to an ultraviolet-light interference field. The Bragg grating coincides with the pattern of exposure of the fiber core to ultraviolet light; in other words, the Bragg grating coincides with the interference fringes. Hence, the problem of tailoring the Bragg wavelength and bandwidth is largely one of tailoring the interference pattern and the placement of the fiber in the interference pattern. In the prior two-beam interferometric method, a single laser beam is split into two beams, which are subsequently recombined to produce an interference pattern at the location of an optical fiber. In the prior phase-mask method, a phase mask is used to diffract a laser beam mainly into two first orders, the interference between which creates the pattern to which an optical fiber is exposed. The prior two-beam interferometric method offers the advantage that the period of the interference pattern can be adjusted to produce gratings over a wide range of Bragg wavelengths, but offers the disadvantage that success depends on precise alignment and high mechanical stability. The prior phase-mask method affords the advantages of compactness of equipment and relative insensitivity to both misalignment and vibration, but does not afford adjustability of the Bragg wavelength. The present method affords both the flexibility of the prior two-beam interferometric method and the compactness and stability of the prior phase-mask method. In this method (see figure), a laser beam propagating along the x axis is normally incident on a phase mask that lies in the (y,z) plane. The phase of light propagating through the mask is modulated with a spatial periodicity, p, along the y axis chosen to diffract the laser light primarily to first order at the angle . (The zero-order laser light propagating along the x axis can be used for alignment and thereafter suppressed during exposure of the fiber.) The diffracted light passes through a concave cylindrical lens, which converts the flat diffracted wave fronts to cylindrical ones, as though the light emanated from a line source. Then two parallel flat mirrors recombine the diffracted beams to form an interference field equivalent to that of two coherent line sources at positions A and B (virtual sources). The interference pattern is a known function of the parameters of the apparatus and of position (x,y) in the interference field. Hence, the tilt, wavelength, and chirp of the Bragg grating can be chosen through suitable adjustments of the apparatus and/or of the position and orientation of the optical fiber. In particular, the Bragg wavelength can be adjusted by moving the fiber along the x axis, and the bandwidth can be modified over a wide range by changing the fiber tilt angle or by moving the phase mask and/or the fiber. Alignment is easy because the zero-order beam defines the x axis. The interference is relatively stable and insensitive to the mechanical vibration because of the gh symmetry and compactness of the apparatus, the fixed positions of the mirrors and lens, and the consequent fixed positions of the two virtual line sources, which are independent of the translations of the phase mask and the laser relative to the lens.
NASA Astrophysics Data System (ADS)
Hou, Guangjin; Lu, Xingyu; Vega, Alexander J.; Polenova, Tatyana
2014-09-01
We report a Phase-Alternating R-Symmetry (PARS) dipolar recoupling scheme for accurate measurement of heteronuclear 1H-X (X = 13C, 15N, 31P, etc.) dipolar couplings in MAS NMR experiments. It is an improvement of conventional C- and R-symmetry type DIPSHIFT experiments where, in addition to the dipolar interaction, the 1H CSA interaction persists and thereby introduces considerable errors in the dipolar measurements. In PARS, phase-shifted RN symmetry pulse blocks applied on the 1H spins combined with π pulses applied on the X spins at the end of each RN block efficiently suppress the effect from 1H chemical shift anisotropy, while keeping the 1H-X dipolar couplings intact. Another advantage over conventional DIPSHIFT experiments, which require the signal to be detected in the form of a reduced-intensity Hahn echo, is that the series of π pulses refocuses the X chemical shift and avoids the necessity of echo formation. PARS permits determination of accurate dipolar couplings in a single experiment; it is suitable for a wide range of MAS conditions including both slow and fast MAS frequencies; and it assures dipolar truncation from the remote protons. The performance of PARS is tested on two model systems, [15N]-N-acetyl-valine and [U-13C,15N]-N-formyl-Met-Leu-Phe tripeptide. The application of PARS for site-resolved measurement of accurate 1H-15N dipolar couplings in the context of 3D experiments is presented on U-13C,15N-enriched dynein light chain protein LC8.
2012-01-01
Background A previous study reported a method for measuring the spectral transmittance of individual human eyelids. A prototype light mask using narrow-band “green” light (λmax = 527 nm) was used to deliver light through closed eyelids in two within-subjects studies. The first study investigated whether an individual-specific light dose could suppress melatonin by 40% through the closed eyelid without disrupting sleep. The light doses were delivered at three times during the night: 1) beginning (while subjects were awake), 2) middle (during rapid eye movement (REM) sleep), and 3) end (during non-REM sleep). The second study investigated whether two individual-specific light doses expected to suppress melatonin by 30% and 60% and delivered through subjects’ closed eyelids before the time of their predicted minimum core body temperature would phase delay the timing of their dim light melatonin onset (DLMO). Findings Compared to a dark control night, light delivered through eyelids suppressed melatonin by 36% (p = 0.01) after 60-minute light exposure at the beginning, 45% (p = 0.01) at the middle, and 56% (p < 0.0001) at the end of the night. In the second study, compared to a dark control night, melatonin was suppressed by 25% (p = 0.03) and by 45% (p = 0.009) and circadian phase, as measured by DLMO, was delayed by 17 minutes (p = 0.03) and 71 minutes (ns) after 60-minute exposures to light levels 1 and 2, respectively. Conclusions These studies demonstrate that individual-specific doses of light delivered through closed eyelids can suppress melatonin and phase shift DLMO and may be used to treat circadian sleep disorders. PMID:22564396
Figueiro, Mariana G; Rea, Mark S
2012-05-07
A previous study reported a method for measuring the spectral transmittance of individual human eyelids. A prototype light mask using narrow-band "green" light (λmax = 527 nm) was used to deliver light through closed eyelids in two within-subjects studies. The first study investigated whether an individual-specific light dose could suppress melatonin by 40% through the closed eyelid without disrupting sleep. The light doses were delivered at three times during the night: 1) beginning (while subjects were awake), 2) middle (during rapid eye movement (REM) sleep), and 3) end (during non-REM sleep). The second study investigated whether two individual-specific light doses expected to suppress melatonin by 30% and 60% and delivered through subjects' closed eyelids before the time of their predicted minimum core body temperature would phase delay the timing of their dim light melatonin onset (DLMO). Compared to a dark control night, light delivered through eyelids suppressed melatonin by 36% (p = 0.01) after 60-minute light exposure at the beginning, 45% (p = 0.01) at the middle, and 56% (p < 0.0001) at the end of the night. In the second study, compared to a dark control night, melatonin was suppressed by 25% (p = 0.03) and by 45% (p = 0.009) and circadian phase, as measured by DLMO, was delayed by 17 minutes (p = 0.03) and 71 minutes (ns) after 60-minute exposures to light levels 1 and 2, respectively. These studies demonstrate that individual-specific doses of light delivered through closed eyelids can suppress melatonin and phase shift DLMO and may be used to treat circadian sleep disorders.
Flexible fabrication of multi-scale integrated 3D periodic nanostructures with phase mask
NASA Astrophysics Data System (ADS)
Yuan, Liang Leon
Top-down fabrication of artificial nanostructures, especially three-dimensional (3D) periodic nanostructures, that forms uniform and defect-free structures over large area with the advantages of high throughput and rapid processing and in a manner that can further monolithically integrate into multi-scale and multi-functional devices is long-desired but remains a considerable challenge. This thesis study advances diffractive optical element (DOE) based 3D laser holographic nanofabrication of 3D periodic nanostructures and develops new kinds of DOEs for advanced diffracted-beam control during the fabrication. Phase masks, as one particular kind of DOE, are a promising direction for simple and rapid fabrication of 3D periodic nanostructures by means of Fresnel diffraction interference lithography. When incident with a coherent beam of light, a suitable phase mask (e.g. with 2D nano-grating) can create multiple diffraction orders that are inherently phase-locked and overlap to form a 3D light interference pattern in the proximity of the DOE. This light pattern is typically recorded in photosensitive materials including photoresist to develop into 3D photonic crystal nanostructure templates. Two kinds of advanced phase masks were developed that enable delicate phase control of multiple diffraction beams. The first exploits femtosecond laser direct writing inside fused silica to assemble multiple (up to nine) orthogonally crossed (2D) grating layers, spaced on Talbot planes to overcome the inherent weak diffraction efficiency otherwise found in low-contrast volume gratings. A systematic offsetting of orthogonal grating layers to establish phase offsets over 0 to pi/2 range provided precise means for controlling the 3D photonic crystal structure symmetry between body centered tetragonal (BCT) and woodpile-like tetragonal (wTTR). The second phase mask consisted of two-layered nanogratings with small sub-wavelength grating periods and phase offset control. That was designed with isotropic properties attractive for generating a complete photonic band gap (PBG). An isolation layer was used between adjacent polymer layers to offer a reversal coating for sample preparation of scanning electron microscopy (SEM) imaging and top surface planarization. Electron beam lithography has been employed to fabricate a multi-level nano-grating phase mask that produces a diamond-like 3D nanostructure via phase mask lithography, promising for creating photonic crystal (PC) templates that can be inverted with high-index materials and form a complete PBG at telecommunication wavelengths. A laser scanning holographic method for 3D exposure in thick photoresist is introduced that combines the unique advantages of large area 3D holographic interference lithography (HIL) with the flexible patterning of laser direct writing to form both micro- and nano-structures in a single exposure step. Phase mask interference patterns accumulated over multiple overlapping scans are shown to stitch seamlessly and form highly uniform 3D nanostructure with beam size scaled to small 200 microm diameter. Further direct-write holography demonstrates monolithical writing of multi-scale lab-on-a-chip with multiple functionalities including on-chip integrated fluorescence. Various 3D periodic nanostructures are demonstrated over a 15 mmx15 mm area, through full 40 microm photoresist thickness and with uniform structural and optical properties revealed by focused ion beam (FIB) milling, SEM imaging and stopband measures. The lateral and axial periods scale from respective 1500 nm to 570 nm and 9.2 microm to 1.2 microm to offer a Gamma-Z stopband at 1.5 microm. Overall, laser scanning is presented as a facile means to embed 3D PC nanostructure within microfluidic channels for integration into an optofluidic lab-on-chip, demonstrating a new laser HIL writing approach for creating multi-scale integrated microsystems.
Evaluation of TF11 attenuated-PSM mask blanks with DUV laser patterning
NASA Astrophysics Data System (ADS)
Xing, Kezhao; Björnberg, Charles; Karlsson, Henrik; Paulsson, Adisa; Beiming, Peter; Vedenpää, Jukka; Walford, Jonathan
2008-05-01
Tightening requirements on resolution, CD uniformity and positional accuracy push the development of improved photomask blanks. One such blank for 45nm node attenuated phase shift masks (att-PSM) provides a thinner chrome film, TF11, with a higher etch rate compared to previous generation NTAR5 att-PSM blanks from the same supplier. FEP-171, a positive chemically amplified resist, is commonly used in mask manufacturing for both e-beam and DUV laser pattern generators. TF11 chrome allows the FEP-171 resist thickness to be decreased at least down to 2000 Å while maintaining sufficient etch resistance, thereby improving photomask CD performance. The lower stress level in TF11 chrome films also reduces the image placement error induced by the material. In this study, TF11 chrome and FEP-171 resist are evaluated with exposures on a 248 nm DUV laser pattern generator, the Sigma7500. Patterning is first characterized for resist thicknesses of 2000 Å to 2600 Å in steps of 100 Å, assessing the minimum feature resolution, CD linearity, isolated-dense CD bias and dose sensitivity. Swing curve analysis shows a minimum near 2200 Å and a maximum near 2500 Å, corresponding closely to the reflectivity measurements provided by the blank supplier. The best overall patterning performance is obtained when operating near the swing maximum. The patterning performance is then studied in more detail with a resist thickness of 2550 Å that corresponds to the reflectivity maximum. This is compared to the results with 2000 Å resist, a standard thickness for e-beam exposures on TF11. The lithographic performance on NTAR5 att-PSM blanks with 3200 Å resist is also included for reference. This evaluation indicates that TF11 blanks with 2550 Å resist provide the best overall mask patterning performance obtained with the Sigma7500, showing a global CD uniformity below 4 nm (3s) and minimum feature resolution below 100 nm.
Invited Article: Mask-modulated lensless imaging with multi-angle illuminations
NASA Astrophysics Data System (ADS)
Zhang, Zibang; Zhou, You; Jiang, Shaowei; Guo, Kaikai; Hoshino, Kazunori; Zhong, Jingang; Suo, Jinli; Dai, Qionghai; Zheng, Guoan
2018-06-01
The use of multiple diverse measurements can make lensless phase retrieval more robust. Conventional diversity functions include aperture diversity, wavelength diversity, translational diversity, and defocus diversity. Here we discuss a lensless imaging scheme that employs multiple spherical-wave illuminations from a light-emitting diode array as diversity functions. In this scheme, we place a binary mask between the sample and the detector for imposing support constraints for the phase retrieval process. This support constraint enforces the light field to be zero at certain locations and is similar to the aperture constraint in Fourier ptychographic microscopy. We use a self-calibration algorithm to correct the misalignment of the binary mask. The efficacy of the proposed scheme is first demonstrated by simulations where we evaluate the reconstruction quality using mean square error and structural similarity index. The scheme is then experimentally tested by recovering images of a resolution target and biological samples. The proposed scheme may provide new insights for developing compact and large field-of-view lensless imaging platforms. The use of the binary mask can also be combined with other diversity functions for better constraining the phase retrieval solution space. We provide the open-source implementation code for the broad research community.
SYNCHROTRON RADIO FREQUENCY PHASE CONTROL SYSTEM
Plotkin, M.; Raka, E.C.; Snyder, H.S.
1963-05-01
A system for canceling varying phase changes introduced by connecting cables and control equipment in an alternating gradient synchrotron is presented. In a specific synchrotron embodiment twelve spaced accelerating stations for the proton bunches are utilized. In order to ensure that the protons receive their boost or kick at the exact instant necessary it is necessary to compensate for phase changes occurring in the r-f circuitry over the wide range of frequencies dictated by the accelerated velocities of the proton bunches. A constant beat frequency is utilized to transfer the r-f control signals through the cables and control equipment to render the phase shift constant and readily compensable. (AEC)
NASA Technical Reports Server (NTRS)
Robinson, E. L.; Fuller, C. A.
1999-01-01
Whole body heat production (HP) and heat loss (HL) were examined to determine their relative contributions to light masking of the circadian rhythm in body temperature (Tb). Squirrel monkey metabolism (n = 6) was monitored by both indirect and direct calorimetry, with telemetered measurement of body temperature and activity. Feeding was also measured. Responses to an entraining light-dark (LD) cycle (LD 12:12) and a masking LD cycle (LD 2:2) were compared. HP and HL contributed to both the daily rhythm and the masking changes in Tb. All variables showed phase-dependent masking responses. Masking transients at L or D transitions were generally greater during subjective day; however, L masking resulted in sustained elevation of Tb, HP, and HL during subjective night. Parallel, apparently compensatory, changes of HL and HP suggest action by both the circadian timing system and light masking on Tb set point. Furthermore, transient HL increases during subjective night suggest that gain change may supplement set point regulation of Tb.
Two AFC Loops For Low CNR And High Dynamics
NASA Technical Reports Server (NTRS)
Hinedi, Sami M.; Aguirre, Sergio
1992-01-01
Two alternative digital automatic-frequency-control (AFC) loops proposed to acquire (or reacquire) and track frequency of received carrier radio signal. Intended for use where carrier-to-noise ratios (CNR's) low and carrier frequency characterized by high Doppler shift and Doppler rate because of high relative speed and acceleration, respectively, between transmitter and receiver. Either AFC loops used in place of phase-locked loop. New loop concepts integrate ideas from classical spectrum-estimation, digital-phase-locked-loop, and Kalman-Filter theories.
Survey Geometry and the Internal Consistency of Recent Cosmic Shear Measurements
DOE Office of Scientific and Technical Information (OSTI.GOV)
Troxel, M.A.; et al.
We explore the impact of an update to the typical approximation for the shape noise term in the analytic covariance matrix for cosmic shear experiments that assumes the absence of survey boundary and mask effects. We present an exact expression for the number of galaxy pairs in this term based on the the survey mask, which leads to more than a factor of three increase in the shape noise on the largest measured scales for the Kilo-Degree Survey (KIDS-450) real-space cosmic shear data. We compare the result of this analytic expression to several alternative methods for measuring the shape noise from the data and find excellent agreement. This update to the covariance resolves any internal model tension evidenced by the previously large cosmological best-fitmore » $$\\chi^2$$ for the KiDS-450 cosmic shear data. The best-fit $$\\chi^2$$ is reduced from 161 to 121 for 118 degrees of freedom. We also apply a correction to how the multiplicative shear calibration uncertainty is included in the covariance. This change, along with a previously known update to the reported effective angular values of the data vector, jointly shift the inferred amplitude of the correlation function to higher values. We find that this improves agreement of the KiDS-450 cosmic shear results with Dark Energy Survey Year 1 and Planck results.« less
The pros and cons of masked priming.
Forster, K I
1998-03-01
Masked priming paradigms offer the promise of tapping automatic, strategy-free lexical processing, as evidenced by the lack of expectancy disconfirmation effects, and proportionality effects in semantic priming experiments. But several recent findings suggest the effects may be prelexical. These findings concern nonword priming effects in lexical decision and naming, the effects of mixed-case presentation on nonword priming, and the dependence of priming on the nature of the distractors in lexical decision, suggesting possible strategy effects. The theory underlying each of these effects is discussed, and alternative explanations are developed that do not preclude a lexical basis for masked priming effects.
SU-E-T-438: Frameless Cranial Stereotactic Radiosurgery Immobilization Effectiveness Evaluation
DOE Office of Scientific and Technical Information (OSTI.GOV)
Tseng, T; Green, S; Sheu, R
Purpose: To evaluate immobilization effectiveness of Brainlab frameless mask in cranial stereotactic radiosurgery (SRS). Methods: Two sets of setup images were collected pre-and post-treatment for 24 frameless SRS cases. The pre-treatment images were obtained after applying 2D-2D kV image-guided shifts with patients in treatment position and approved by physicians; the post-treatment images were taken immediately after treatment completion. All cases were treated on a Novalis linac with ExacTrac positioning system and Exact Couch. The two image sets were compared with the correctional shifts measured by ExacTrac 6D auto-fusion. The shift differences were considered patient motion within the frameless mask andmore » were used to evaluate its effectiveness for immobilization. Two-tailed paired t-test was applied for significance comparison. Results: The correctional shifts (mean±STD, median) of pre-and post-treatment images were 0.33±0.27mm, 0.26mm and 0.34±0.27mm, 0.23mm (p=0.740) in lateral direction; 0.32±0.29mm, 0.22mm and 0.48±0.30mm, 0.50mm (p=0.012) in longitudinal direction; 0.31±0.22mm, 0.24mm and 0.33±0.21mm, 0.36mm (p=0.623) in vertical direction. The radial correctional shifts (mean±STD, median) of pre -and post-treatment images were 0.60±0.38mm, 0.45mm and 0.75±0.31mm, 0.66mm (p=0.033). The shift differences (mean±STD, median, maximum) were 0.35±0.28mm, 0.3mm, 1.05mm, 0.34±0.28mm, 0.3mm, 1.00mm, 0.24±0.15mm, 0.21mm, 0.60mm and 0.61±0.32mm, 0.57mm, 1.40mm in lateral, longitudinal, vertical and radial direction, respectively. Two shifts greater than 1 mm (1.06mm and 1.02mm) were acquired from post-treatment images. However, the shift differences were only 0.09 and 0.19mm for these two shifts. Two patients with shift differences greater than 1mm (1.05 and 1.04mm) were observed and didn’t coincide with those two who had post-correctional shifts greater than 1mm. Conclusion: Image-guided SRS allowed us to set up patients with sub-millimeter accuracy relative to simulation position. However, patient motion during treatment could affect treatment accuracy. Our Result shows that Brainlab frameless mask provides reasonable patient immobilization and maintains the mean post-treatment position within sub-millimeter accuracy with some borderline results observed.« less
Virkkala, Raimo; Lehikoinen, Aleksi
2014-10-01
Climate change has been shown to cause poleward range shifts of species. These shifts are typically demonstrated using presence-absence data, which can mask the potential changes in the abundance of species. Moreover, changes in the mean centre of weighted density of species are seldom examined, and comparisons between these two methods are even rarer. Here, we studied the change in the mean weighted latitude of density (MWLD) of 94 bird species in Finland, northern Europe, using data covering a north-south gradient of over 1000 km from the 1970s to the 2010s. The MWLD shifted northward on average 1.26 km yr(-1) , and this shift was significantly stronger in northern species compared to southern species. These shifts can be related to climate warming during the study period, because the annual temperature had increased more in northern Finland (by 1.7 °C) than in southern Finland (by 1.4 °C), although direct causal links cannot be shown. Density shifts of species distributed over the whole country did not differ from shifts in species situated on the edge of the species range in southern and northern species. This means that density shifts occur both in the core and on the edge of species distribution. The species-specific comparison of MWLD values with corresponding changes in the mean weighted latitude using presence-absence atlas data (MWL) revealed that the MWLD moved more slowly than the MWL in the atlas data in the southern species examined, but more rapidly in the northern species. Our findings highlight that population densities are also moving rapidly towards the poles and the use of presence-absence data can mask the shift of population densities. We encourage use of abundance data in studies considering the effects of climate change on biodiversity. © 2014 John Wiley & Sons Ltd.
Audio steganography by amplitude or phase modification
NASA Astrophysics Data System (ADS)
Gopalan, Kaliappan; Wenndt, Stanley J.; Adams, Scott F.; Haddad, Darren M.
2003-06-01
This paper presents the results of embedding short covert message utterances on a host, or cover, utterance by modifying the phase or amplitude of perceptually masked or significant regions of the host. In the first method, the absolute phase at selected, perceptually masked frequency indices was changed to fixed, covert data-dependent values. Embedded bits were retrieved at the receiver from the phase at the selected frequency indices. Tests on embedding a GSM-coded covert utterance on clean and noisy host utterances showed no noticeable difference in the stego compared to the hosts in speech quality or spectrogram. A bit error rate of 2 out of 2800 was observed for a clean host utterance while no error occurred for a noisy host. In the second method, the absolute phase of 10 or fewer perceptually significant points in the host was set in accordance with covert data. This resulted in a stego with successful data retrieval and a slightly noticeable degradation in speech quality. Modifying the amplitude of perceptually significant points caused perceptible differences in the stego even with small changes of amplitude made at five points per frame. Finally, the stego obtained by altering the amplitude at perceptually masked points showed barely noticeable differences and excellent data recovery.
Prediction and outcomes of impossible mask ventilation: a review of 50,000 anesthetics.
Kheterpal, Sachin; Martin, Lizabeth; Shanks, Amy M; Tremper, Kevin K
2009-04-01
There are no existing data regarding risk factors for impossible mask ventilation and limited data regarding its incidence. The authors sought to determine the incidence, predictors, and outcomes associated with impossible mask ventilation. The authors performed an observational study over a 4-yr period. For each adult patient undergoing a general anesthetic, preoperative patient characteristics, detailed airway physical exam, and airway outcome data were collected. The primary outcome was impossible mask ventilation defined as the inability to exchange air during bag-mask ventilation attempts, despite multiple providers, airway adjuvants, or neuromuscular blockade. Secondary outcomes included the final, definitive airway management technique and direct laryngoscopy view. The incidence of impossible mask ventilation was calculated. Independent (P < 0.05) predictors of impossible mask ventilation were identified by performing a logistic regression full model fit. Over a 4-yr period from 2004 to 2008, 53,041 attempts at mask ventilation were recorded. A total of 77 cases of impossible mask ventilation (0.15%) were observed. Neck radiation changes, male sex, sleep apnea, Mallampati III or IV, and presence of beard were identified as independent predictors. The receiver-operating-characteristic area under the curve for this model was 0.80 +/- 0.03. Nineteen impossible mask ventilation patients (25%) also demonstrated difficult intubation, with 15 being intubated successfully. Twelve patients required an alternative intubation technique, including two surgical airways and two patients who were awakened and underwent successful fiberoptic intubation. Impossible mask ventilation is an infrequent airway event that is associated with difficult intubation. Neck radiation changes represent the most significant clinical predictor of impossible mask ventilation in the patient dataset.
Cost-effective masks for deep x-ray lithography
NASA Astrophysics Data System (ADS)
Scheunemann, Heinz-Ulrich; Loechel, Bernd; Jian, Linke; Schondelmaier, Daniel; Desta, Yohannes M.; Goettert, Jost
2003-04-01
The production of X-ray masks is one of the key techniques for X-ray lithography and the LIGA process. Different ways for the fabrication of X-ray masks has been established. Very sophisticated, difficult and expensive procedures are required to produce high precision and high quality X-ray masks. In order to minimize the cost of an X-ray mask, the mask blank must be inexpensive and readily available. The steps involved in the fabrication process must also be minimal. In the past, thin membranes made of titanium, silicon carbide, silicon nitride (2-5μm) or thick beryllium substrates (500μm) have been used as mask blanks. Thin titanium and silicon compounds have very high transparency for X-rays; therefore, these materials are predestined for use as mask membrane material. However, the handling and fabrication of thin membranes is very difficult, thus expensive. Beryllium is highly transparent to X-rays, but the processing and use of beryllium is risky due to potential toxicity. During the past few years graphite based X-ray masks have been in use at various research centers, but the sidewall quality of the generated resist patterns is in the range of 200-300 nm Ra. We used polished graphite to improve the sidewall roughness, but polished graphite causes other problems in the fabrication of X-ray masks. This paper describes the advantages associated with the use of polished graphite as mask blank as well as the fabrication process for this low cost X-ray mask. Alternative membrane materials will also be discussed.
Righetti, Laura; Rolli, Enrico; Galaverna, Gianni; Suman, Michele; Bruni, Renato
2017-01-01
“Masked mycotoxins” senso strictu are conjugates of mycotoxins resulting from metabolic pathways activated by the interplay between pathogenic fungi and infected plants. Zearalenone, an estrogenic mycotoxin produced by Fusarium spp, was the first masked mycotoxin ever described in the literature, but its biotransformation has been studied to a lesser extent if compared to other compounds such as deoxynivalenol. We presented herein the first application of organ and tissue culture techniques to study the metabolic fate of zearalenone in durum wheat, using an untargeted HR-LCMS approach. A complete, quick absorption of zearalenone by uninfected plant organs was noticed, and its biotransformation into a large spectrum of phase I and phase II metabolites has been depicted. Therefore, wheat organ tissue cultures can be effectively used as a biocatalytic tool for the production of masked mycotoxins, as well as a replicable model for the investigation of the interplay between mycotoxins and wheat physiology. PMID:29145415
Kasahara, Koji; Ohyama, Yoshifumi; Kokubo, Tetsuro
2011-01-01
Saccharomyces cerevisiae Hmo1 binds to the promoters of ∼70% of ribosomal protein genes (RPGs) at high occupancy, but is observed at lower occupancy on the remaining RPG promoters. In Δhmo1 cells, the transcription start site (TSS) of the Hmo1-enriched RPS5 promoter shifted upstream, while the TSS of the Hmo1-limited RPL10 promoter did not shift. Analyses of chimeric RPS5/RPL10 promoters revealed a region between the RPS5 upstream activating sequence (UAS) and core promoter, termed the intervening region (IVR), responsible for strong Hmo1 binding and an upstream TSS shift in Δhmo1 cells. Chromatin immunoprecipitation analyses showed that the RPS5-IVR resides within a nucleosome-free region and that pre-initiation complex (PIC) assembly occurs at a site between the IVR and a nucleosome overlapping the TSS (+1 nucleosome). The PIC assembly site was shifted upstream in Δhmo1 cells on this promoter, indicating that Hmo1 normally masks the RPS5-IVR to prevent PIC assembly at inappropriate site(s). This novel mechanism ensures accurate transcriptional initiation by delineating the 5′- and 3′-boundaries of the PIC assembly zone. PMID:21288884
Design of a Multistep Phase Mask for High-Energy Terahertz Pulse Generation by Optical Rectification
NASA Astrophysics Data System (ADS)
Avetisyan, Y.; Makaryan, A.; Tadevosyan, V.; Tonouchi, M.
2017-12-01
A new scheme for generating high-energy terahertz (THz) pulses based on using a multistep phase mask (MSPM) is suggested and analyzed. The mask is placed on the entrance surface of the nonlinear optical (NLO) crystal eliminating the necessity of the imaging optics. In contrast to the contact grating method, introduction of large amounts of angular dispersion is avoided. The operation principle of the suggested scheme is based on the fact that the MSPM splits a single input beam into many smaller time-delayed "beamlets," which together form a discretely tilted-front laser pulse in NLO crystal. The analysis of THz-pulse generation in ZnTe and lithium niobate (LN) crystals shows that application of ZnTe crystal is more preferable, especially when long-wavelength pump sources are used. The dimensions of the mask's steps required for high-energy THz-pulse generation in ZnTe and LN crystals are calculated. The optimal number of steps is estimated, taking into account individual beamlet's spatial broadening and problems related to the mask fabrication. The proposed method is a promising way to develop high-energy, monolithic, and alignment-free THz-pulse sources.
The time course of protecting a visual memory representation from perceptual interference
van Moorselaar, Dirk; Gunseli, Eren; Theeuwes, Jan; N. L. Olivers, Christian
2015-01-01
Cueing a remembered item during the delay of a visual memory task leads to enhanced recall of the cued item compared to when an item is not cued. This cueing benefit has been proposed to reflect attention within visual memory being shifted from a distributed mode to a focused mode, thus protecting the cued item against perceptual interference. Here we investigated the dynamics of building up this mnemonic protection against visual interference by systematically varying the stimulus onset asynchrony (SOA) between cue onset and a subsequent visual mask in an orientation memory task. Experiment 1 showed that a cue counteracted the deteriorating effect of pattern masks. Experiment 2 demonstrated that building up this protection is a continuous process that is completed in approximately half a second after cue onset. The similarities between shifting attention in perceptual and remembered space are discussed. PMID:25628555
Rowe, James B.; Ghosh, Boyd C. P.; Carlyon, Robert P.; Plack, Christopher J.; Gockel, Hedwig E.
2014-01-01
Under binaural listening conditions, the detection of target signals within background masking noise is substantially improved when the interaural phase of the target differs from that of the masker. Neural correlates of this binaural masking level difference (BMLD) have been observed in the inferior colliculus and temporal cortex, but it is not known whether degeneration of the inferior colliculus would result in a reduction of the BMLD in humans. We used magnetoencephalography to examine the BMLD in 13 healthy adults and 13 patients with progressive supranuclear palsy (PSP). PSP is associated with severe atrophy of the upper brain stem, including the inferior colliculus, confirmed by voxel-based morphometry of structural MRI. Stimuli comprised in-phase sinusoidal tones presented to both ears at three levels (high, medium, and low) masked by in-phase noise, which rendered the low-level tone inaudible. Critically, the BMLD was measured using a low-level tone presented in opposite phase across ears, making it audible against the noise. The cortical waveforms from bilateral auditory sources revealed significantly larger N1m peaks for the out-of-phase low-level tone compared with the in-phase low-level tone, for both groups, indicating preservation of early cortical correlates of the BMLD in PSP. In PSP a significant delay was observed in the onset of the N1m deflection and the amplitude of the P2m was reduced, but these differences were not restricted to the BMLD condition. The results demonstrate that although PSP causes subtle auditory deficits, binaural processing can survive the presence of significant damage to the upper brain stem. PMID:25231610
Hughes, Laura E; Rowe, James B; Ghosh, Boyd C P; Carlyon, Robert P; Plack, Christopher J; Gockel, Hedwig E
2014-12-15
Under binaural listening conditions, the detection of target signals within background masking noise is substantially improved when the interaural phase of the target differs from that of the masker. Neural correlates of this binaural masking level difference (BMLD) have been observed in the inferior colliculus and temporal cortex, but it is not known whether degeneration of the inferior colliculus would result in a reduction of the BMLD in humans. We used magnetoencephalography to examine the BMLD in 13 healthy adults and 13 patients with progressive supranuclear palsy (PSP). PSP is associated with severe atrophy of the upper brain stem, including the inferior colliculus, confirmed by voxel-based morphometry of structural MRI. Stimuli comprised in-phase sinusoidal tones presented to both ears at three levels (high, medium, and low) masked by in-phase noise, which rendered the low-level tone inaudible. Critically, the BMLD was measured using a low-level tone presented in opposite phase across ears, making it audible against the noise. The cortical waveforms from bilateral auditory sources revealed significantly larger N1m peaks for the out-of-phase low-level tone compared with the in-phase low-level tone, for both groups, indicating preservation of early cortical correlates of the BMLD in PSP. In PSP a significant delay was observed in the onset of the N1m deflection and the amplitude of the P2m was reduced, but these differences were not restricted to the BMLD condition. The results demonstrate that although PSP causes subtle auditory deficits, binaural processing can survive the presence of significant damage to the upper brain stem. Copyright © 2014 the American Physiological Society.
Effect of masking phase-only holograms on the quality of reconstructed images.
Deng, Yuanbo; Chu, Daping
2016-04-20
A phase-only hologram modulates the phase of the incident light and diffracts it efficiently with low energy loss because of the minimum absorption. Much research attention has been focused on how to generate phase-only holograms, and little work has been done to understand the effect and limitation of their partial implementation, possibly due to physical defects and constraints, in particular as in the practical situations where a phase-only hologram is confined or needs to be sliced or tiled. The present study simulates the effect of masking phase-only holograms on the quality of reconstructed images in three different scenarios with different filling factors, filling positions, and illumination intensity profiles. Quantitative analysis confirms that the width of the image point spread function becomes wider and the image quality decreases, as expected, when the filling factor decreases, and the image quality remains the same for different filling positions as well. The width of the image point spread function as derived from different filling factors shows a consistent behavior to that as measured directly from the reconstructed image, especially as the filling factor becomes small. Finally, mask profiles of different shapes and intensity distributions are shown to have more complicated effects on the image point spread function, which in turn affects the quality and textures of the reconstructed image.
Lee, Su-Hyun; Lee, Hwang-Jae; Chang, Won Hyuk; Choi, Byung-Ok; Lee, Jusuk; Kim, Jeonghun; Ryu, Gyu-Ha; Kim, Yun-Hee
2017-11-28
A robotic exoskeleton device is an intelligent system designed to improve gait performance and quality of life for the wearer. Robotic technology has developed rapidly in recent years, and several robot-assisted gait devices were developed to enhance gait function and activities of daily living in elderly adults and patients with gait disorders. In this study, we investigated the effects of the Gait-enhancing Mechatronic System (GEMS), a new wearable robotic hip-assist device developed by Samsung Electronics Co, Ltd., Korea, on gait performance and foot pressure distribution in elderly adults. Thirty elderly adults who had no neurological or musculoskeletal abnormalities affecting gait participated in this study. A three-dimensional (3D) motion capture system, surface electromyography and the F-Scan system were used to collect data on spatiotemporal gait parameters, muscle activity and foot pressure distribution under three conditions: free gait without robot assistance (FG), robot-assisted gait with zero torque (RAG-Z) and robot-assisted gait (RAG). We found increased gait speed, cadence, stride length and single support time in the RAG condition. Reduced rectus femoris and medial gastrocnemius muscle activity throughout the terminal stance phase and reduced effort of the medial gastrocnemius muscle throughout the pre-swing phase were also observed in the RAG condition. In addition, walking with the assistance of GEMS resulted in a significant increase in foot pressure distribution, specifically in maximum force and peak pressure of the total foot, medial masks, anterior masks and posterior masks. The results of the present study reveal that GEMS may present an alternative way of restoring age-related changes in gait such as gait instability with muscle weakness, reduced step force and lower foot pressure in elderly adults. In addition, GEMS improved gait performance by improving push-off power and walking speed and reducing muscle activity in the lower extremities. NCT02843828 .
Optimal mask characterization by Surrogate Wafer Print (SWaP) method
NASA Astrophysics Data System (ADS)
Kimmel, Kurt R.; Hoellein, Ingo; Peters, Jan Hendrick; Ackmann, Paul; Connolly, Brid; West, Craig
2008-10-01
Traditionally, definition of mask specifications is done completely by the mask user, while characterization of the mask relative to the specifications is done completely by the mask maker. As the challenges of low-k1 imaging continue to grow in scope of designs and in absolute complexity, the inevitable partnership between wafer lithographers and mask makers has strengthened as well. This is reflected in the jointly owned mask facilities and device manufacturers' continued maintenance of fully captive mask shops which foster the closer mask-litho relationships. However, while some device manufacturers have leveraged this to optimize mask specifications before the mask is built and, therefore, improve mask yield and cost, the opportunity for post-fabrication partnering on mask characterization is more apparent and compelling. The Advanced Mask Technology Center (AMTC) has been investigating the concept of assessing how a mask images, rather than the mask's physical attributes, as a technically superior and lower-cost method to characterize a mask. The idea of printing a mask under its intended imaging conditions, then characterizing the imaged wafer as a surrogate for traditional mask inspections and measurements represents the ultimate method to characterize a mask's performance, which is most meaningful to the user. Surrogate wafer print (SWaP) is already done as part of leading-edge wafer fab mask qualification to validate defect and dimensional performance. In the past, the prospect of executing this concept has generally been summarily discarded as technically untenable and logistically intractable. The AMTC published a paper at BACUS 2007 successfully demonstrating the performance of SWaP for the characterization of defects as an alternative to traditional mask inspection [1]. It showed that this concept is not only feasible, but, in some cases, desirable. This paper expands on last year's work at AMTC to assess the full implementation of SWaP as an enhancement to mask characterization quality including defectivity, dimensional control, pattern fidelity, and in-plane distortion. We present a thorough analysis of both the technical and logistical challenges coupled with an objective view of the advantages and disadvantages from both the technical and financial perspectives. The analysis and model used by the AMTC will serve to provoke other mask shops to prepare their own analyses then consider this new paradigm for mask characterization and qualification.
An alternating voltage battery with two salt-water oscillators
NASA Astrophysics Data System (ADS)
Cervellati, Rinaldo; Soldà, Roberto
2001-05-01
We built a simple alternating voltage battery that periodically reverses value and sign of its electromotive force (emf). This battery consists of two coupled concentration salt-water oscillators that are phase shifted by initially extracting some drops of salt solution from one of the two oscillators. Although the actual frequency (period: ˜30 s) and emf (˜±55 mV) is low, our battery is suitable to demonstrate a practical application of oscillating systems in the physical, chemical, or biological laboratory for undergraduates. Interpretation of the phenomenon is given.
Volume Phase Masks in Photo-Thermo-Refractive Glass
2014-10-06
development when forming the nanocrystals. Fig. 1.1 shows the refractive index change curves for some common glass melts when exposed to a beam at 325 nm...integral curve to the curve for the ideal phase mask. If there is a deviation in the experimental curve from the ideal curve , whether the overlap...redevelopments of the sample. Note that the third point on the spherical curve and the third and fourth points on the coma y curve have larger error bars than
Scharlau, Ingrid; Neumann, Odmar
2003-08-01
Four experiments investigated the influence of a metacontrast-masked prime on temporal order judgments. The main results were (1) that a masked prime reduced the latency of the mask's conscious perception (perceptual latency priming), (2) that this effect was independent of whether the prime suffered strong or weak masking, (3) that it was unaffected by the degree of visual similarity between the prime and the mask, and that (4) there was no difference between congruent and incongruent primes. Finding (1) suggests that location cueing affects not only response times but also the latency of conscious perception. (2) The finding that priming was unaffected by the prime's detectability argues against a response bias interpretation of this effect. (3) Since visual similarity had no effect on the prime's efficiency, it is unlikely that sensory priming was involved. (4) The lack of a divergence between the effects of congruent and incongruent primes implies a functional difference between the judgments in the temporal order judgment task and speeded responses that have demonstrated differential effects of congruent and incongruent primes (e.g., Klotz & Neumann, 1999). These results can best be interpreted by assuming that the prime affects perceptual latency by initiating a shift of attention, as suggested by the Asynchronous Updating Model (AUM; Neumann 1978, 1982).
Anticipating and controlling mask costs within EDA physical design
NASA Astrophysics Data System (ADS)
Rieger, Michael L.; Mayhew, Jeffrey P.; Melvin, Lawrence S.; Lugg, Robert M.; Beale, Daniel F.
2003-08-01
For low k1 lithography, more aggressive OPC is being applied to critical layers, and the number of mask layers with OPC treatments is growing rapidly. The 130 nm, process node required, on average, 8 layers containing rules- or model-based OPC. The 90 nm node will have 16 OPC layers, of which 14 layers contain aggressive model-based OPC. This escalation of mask pattern complexity, coupled with the predominant use of vector-scan e-beam (VSB) mask writers contributes to the rising costs of advanced mask sets. Writing times for OPC layouts are several times longer than for traditional layouts, making mask exposure the single largest cost component for OPC masks. Lower mask yields, another key factor in higher mask costs, is also aggravated by OPC. Historical mask set costs are plotted below. The initial cost of a 90 nm-node mask set will exceed one million dollars. The relative impact of mask cost on chip depends on how many total wafers are printed with each mask set. For many foundry chips, where unit production is often well below 1000 wafers, mask costs are larger than wafer processing costs. Further increases in NRE may begin to discourage these suppliers' adoption to 90 nm and smaller nodes. In this paper we will outline several alternatives for reducing mask costs by strategically leveraging dimensional margins. Dimensional specifications for a particular masking layer usually are applied uniformly to all features on that layer. As a practical matter, accuracy requirements on different features in the design may vary widely. Take a polysilicon layer, for example: global tolerance specifications for that layer are driven by the transistor-gate requirements; but these parameters over-specify interconnect feature requirements. By identifying features where dimensional accuracy requirements can be reduced, additional margin can be leveraged to reduce OPC complexity. Mask writing time on VSB tools will drop in nearly direct proportion to reduce shot count. By inspecting masks with reference to feature-dependent margins, instead of uniform specifications, mask yield can be effectively increased further reducing delivered mask expense.
Laryngeal mask airway for airway control during percutaneous dilatational tracheostomy.
Pratt, T; Bromilow, J
2011-11-01
Percutaneous dilatational tracheostomy is a common bedside procedure in critical care for patients requiring prolonged mechanical ventilation. The traditional technique requires withdrawal of the endotracheal tube to a proximal position to facilitate tracheostomy insertion, but this carries the risk of inadvertent extubation and does not prevent cuff rupture. Use of a supraglottic airway such as the laryngeal mask airway may avoid these risks and could provide a safe alternative to the endotracheal tube. We present an appraisal of the literature to date. We found reasonable evidence to show improved ventilation and bronchoscopic visualisation with the laryngeal mask airway, but this has not been translated into improved outcome. There is currently insufficient evidence to draw conclusions about the safety of the laryngeal mask airway during percutaneous dilatational tracheostomy.
Tinnitus as an alarm bell: stress reaction tinnitus model.
Alpini, D; Cesarani, A
2006-01-01
Stress is a significant factor influencing the clinical course of tinnitus. Auditory system is particularly sensitive to the effects of different stress factors (chemical, oxidative, emotional, etc.). Different stages of reaction (alarm, resistance, exhaustion) lead to different characteristics of tinnitus and different therapeutic approaches. Individual characteristics of stress reaction may explain different aspects of tinnitus in various patients with different responses to treatment, despite similar audiological and etiological factors. A model based on individual reactions to stress factors (stress reaction tinnitus model) could explain tinnitus as an alarm signal, just like an 'alarm bell', informing the patient that something potentially dangerous for subject homeostasis is happening. Tinnitus could become a disabling symptom when the subject is chronically exposed to a stress factor and is unable to switch off the alarm. Stress signals, specific for each patient, have to be identified during the 'alarm' phase in order to prevent an evolution toward the 'resistance' and 'exhaustion' phases. In these phases, identification of stressor is no more sufficient, due to the organization of a 'paradoxical auditory memory' and a 'pathologically shifted attention to tinnitus'. Identification of stress reaction phase requires accurate otolaryngology and anamnesis combined with audiological matching tests (Feldman Masking Test, for example) and psychometric questionnaires (Tinnitus Reaction and Tinnitus Cognitive Questionnaires). Copyright (c) 2006 S. Karger AG, Basel.
Surgical Face Masks Worn by Patients with Multidrug-Resistant Tuberculosis
Mphahlele, Matsie; Stoltz, Anton; Venter, Kobus; Mathebula, Rirhandzu; Masotla, Thabiso; Lubbe, Willem; Pagano, Marcello; First, Melvin; Jensen, Paul A.; van der Walt, Martie; Nardell, Edward A.
2012-01-01
Rationale: Drug-resistant tuberculosis transmission in hospitals threatens staff and patient health. Surgical face masks used by patients with tuberculosis (TB) are believed to reduce transmission but have not been rigorously tested. Objectives: We sought to quantify the efficacy of surgical face masks when worn by patients with multidrug-resistant TB (MDR-TB). Methods: Over 3 months, 17 patients with pulmonary MDR-TB occupied an MDR-TB ward in South Africa and wore face masks on alternate days. Ward air was exhausted to two identical chambers, each housing 90 pathogen-free guinea pigs that breathed ward air either when patients wore surgical face masks (intervention group) or when patients did not wear masks (control group). Efficacy was based on differences in guinea pig infections in each chamber. Measurements and Main Results: Sixty-nine of 90 control guinea pigs (76.6%; 95% confidence interval [CI], 68–85%) became infected, compared with 36 of 90 intervention guinea pigs (40%; 95% CI, 31–51%), representing a 56% (95% CI, 33–70.5%) decreased risk of TB transmission when patients used masks. Conclusions: Surgical face masks on patients with MDR-TB significantly reduced transmission and offer an adjunct measure for reducing TB transmission from infectious patients. PMID:22323300
Teo, Ming; Amis, Terence; Lee, Sharon; Falland, Karina; Lambert, Stephen; Wheatley, John
2011-01-01
Study Objective: Continuous positive airway pressure (CPAP) titration studies are commonly performed using a nasal mask but some patients may prefer a full-face or oronasal mask. There is little evidence regarding the equivalence of different mask interfaces used to initiate treatment. We hypothesized that oronasal breathing when using an oronasal mask increases upper airway collapsibility and that a higher pressure may be required to maintain airway patency. We also assessed patient preferences for the 2 mask interfaces. Design: Prospective, randomized, cross-over design with 2 consecutive CPAP titration nights. Setting: Accredited laboratory in a university hospital. Patients or Participants: Twenty-four treatment-naive subjects with obstructive sleep apnea syndrome and respiratory disturbance index of greater than 15 events per hour. Interventions: CPAP titration was performed using an auto-titrating machine with randomization to a nasal or oronasal mask, followed by a second titration night using the alternate mask style. Measurements and Results: There was no significant difference in the mean pressures determined between nasal and oronasal masks, although 43% of subjects had nasal-to-oronasal mask-pressure differences of 2 cm H2O or more. Residual respiratory events, arousals, and measured leak were all greater with the oronasal mask. Seventy-nine percent of subjects preferred the nasal mask. Conclusions: Patients with obstructive sleep apnea syndrome can generally switch between nasal and oronasal masks without changing machine pressure, although there are individual differences that may be clinically significant. Measured leak is greater with the oronasal mask. Most patients with obstructive sleep apnea syndrome prefer a nasal mask as the interface for initiation of CPAP. Clinical Trial Registration: Australian New Zealand Clinical Trials Registry (ANZCTR). ACTRN: ACTRN12611000243910. URL: http://www.ANZCTR.org.au/ACTRN12611000243910.aspx Citation: Teo M; Amis T; Lee S; Falland K; Lambert S; Wheatley J. Equivalence of nasal and oronasal masks during initial CPAP titration for obstructive sleep apnea syndrome. SLEEP 2011;34(7):951-955. PMID:21731145
Coral–algal phase shifts alter fish communities and reduce fisheries production
Ainsworth, Cameron H; Mumby, Peter J
2015-01-01
Anthropogenic stress has been shown to reduce coral coverage in ecosystems all over the world. A phase shift towards an algae-dominated system may accompany coral loss. In this case, the composition of the reef-associated fish assemblage will change and human communities relying on reef fisheries for income and food security may be negatively impacted. We present a case study based on the Raja Ampat Archipelago in Eastern Indonesia. Using a dynamic food web model, we simulate the loss of coral reefs with accompanied transition towards an algae-dominated state and quantify the likely change in fish populations and fisheries productivity. One set of simulations represents extreme scenarios, including 100% loss of coral. In this experiment, ecosystem changes are driven by coral loss itself and a degree of habitat dependency by reef fish is assumed. An alternative simulation is presented without assumed habitat dependency, where changes to the ecosystem are driven by historical observations of reef fish communities when coral is lost. The coral–algal phase shift results in reduced biodiversity and ecosystem maturity. Relative increases in the biomass of small-bodied fish species mean higher productivity on reefs overall, but much reduced landings of traditionally targeted species. PMID:24953835
Multiple-stage pure phase encoding with biometric information
NASA Astrophysics Data System (ADS)
Chen, Wen
2018-01-01
In recent years, many optical systems have been developed for securing information, and optical encryption/encoding has attracted more and more attention due to the marked advantages, such as parallel processing and multiple-dimensional characteristics. In this paper, an optical security method is presented based on pure phase encoding with biometric information. Biometric information (such as fingerprint) is employed as security keys rather than plaintext used in conventional optical security systems, and multiple-stage phase-encoding-based optical systems are designed for generating several phase-only masks with biometric information. Subsequently, the extracted phase-only masks are further used in an optical setup for encoding an input image (i.e., plaintext). Numerical simulations are conducted to illustrate the validity, and the results demonstrate that high flexibility and high security can be achieved.
Application of Soft Computing in Coherent Communications Phase Synchronization
NASA Technical Reports Server (NTRS)
Drake, Jeffrey T.; Prasad, Nadipuram R.
2000-01-01
The use of soft computing techniques in coherent communications phase synchronization provides an alternative to analytical or hard computing methods. This paper discusses a novel use of Adaptive Neuro-Fuzzy Inference Systems (ANFIS) for phase synchronization in coherent communications systems utilizing Multiple Phase Shift Keying (MPSK) modulation. A brief overview of the M-PSK digital communications bandpass modulation technique is presented and it's requisite need for phase synchronization is discussed. We briefly describe the hybrid platform developed by Jang that incorporates fuzzy/neural structures namely the, Adaptive Neuro-Fuzzy Interference Systems (ANFIS). We then discuss application of ANFIS to phase estimation for M-PSK. The modeling of both explicit, and implicit phase estimation schemes for M-PSK symbols with unknown structure are discussed. Performance results from simulation of the above scheme is presented.
Simultaneous Chemical and Optical Patterning of Polyacrylonitrile Film by Vapor-Based Reaction.
Shin, Jae-Won; Lee, Choonghyeon; Cha, Sang-Ho; Jang, Jyongsik; Lee, Kyung Jin
2015-06-01
The surface of polyacrylonitrile (PAN) film is treated with ethyleneamines (EDA) in a simple chemical vapor phase reaction. Successful introduction of amine functional groups on the cyano group of PAN backbone is verified by FT-IR and NMR measurements. Further UV-vis and photoluminescence analyses show a red shift of the emission peak after repeated EDA treatment, which might be attributed to the formation of imine conjugation from newly formed carbon-nitrogen bonds on the PAN backbone. Further confocal laser scanning microscopy reveals that selective patterning of EDA on PAN films is possible via local polydimethylsiloxane masking. The results indicate that both chemical and optical patterning on PAN film can be realized via a single reaction and show the potential of this novel methodology in selective patterning. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
NASA Astrophysics Data System (ADS)
Grobnic, Dan; Mihailov, Stephen J.; Ding, H.; Bilodeau, F.; Smelser, Christopher W.
2005-05-01
Multimode sapphire fiber Bragg gratings (SFBG) made with an IR femtosecond laser and a phase mask were probed using tapered single mode fibers of different taper diameters producing single and low order mode reflection/transmission responses. A configuration made of an input single mode tapered fiber and multimode silica fiber used for output coupling was also tested and has delivered a filtered multimode transmission spectrum. The tapered coupling improved the spectral resolution of the SFBG as compared to its multimode responses previously reported. Such improvements facilitate the utilization of the SFBG as a high temperature sensor. Wavelength shifts of the single mode response were monitored as a function of temperature up to 1500 °C and were consistent with the measurement obtained from the multimode response published previously.
Interferometric at-wavelength flare characterization of EUV optical systems
Naulleau, Patrick P.; Goldberg, Kenneth Alan
2001-01-01
The extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) provides the high-accuracy wavefront characterization critical to the development of EUV lithography systems. Enhancing the implementation of the PS/PDI can significantly extend its spatial-frequency measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wavefront and flare. The enhanced technique employs a hybrid spatial/temporal-domain point diffraction interferometer (referred to as the dual-domain PS/PDI) that is capable of suppressing the scattered-reference-light noise that hinders the conventional PS/PDI. Using the dual-domain technique in combination with a flare-measurement-optimized mask and an iterative calculation process for removing flare contribution caused by higher order grating diffraction terms, the enhanced PS/PDI can be used to simultaneously measure both figure and flare in optical systems.
The Four-Quadrant Phase-Mask Coronagraph. I. Principle
NASA Astrophysics Data System (ADS)
Rouan, D.; Riaud, P.; Boccaletti, A.; Clénet, Y.; Labeyrie, A.
2000-11-01
We describe a new type of coronagraph, based on the principle of a phase mask as proposed by Roddier and Roddier a few years ago but using an original mask design found by one of us (D. R.), a four-quadrant binary phase mask (0, π) covering the full field of view at the focal plane. The mutually destructive interferences of the coherent light from the main source produce a very efficient nulling. The computed rejection rate of this coronagraph appears to be very high since, when perfectly aligned and phase-error free, it could in principle reduce the total amount of light from the bright source by a factor of 108, corresponding to a gain of 20 mag in brightness at the location of the first Airy ring, relative to the Airy peak. In the real world the gain is of course reduced by a strong factor, but nulling is still performing quite well, provided that the perturbation of the phase, for instance, due to the Earth's atmosphere, is efficiently corrected by adaptive optics. We show from simulations that a detection at a contrast of 10 mag between a star and a faint companion is achievable in excellent conditions, while 8 mag appears routinely feasible. This coronagraph appears less sensitive to atmospheric turbulence and has a larger dynamic range than other recently proposed nulling techniques: the phase-mask coronagraph (by Roddier and Roddier) or the Achromatic Interfero-Coronagraph (by Gay and Rabbia). We present the principle of the four-quadrant coronagraph and results of a first series of simulations. We compare those results with theoretical performances of other devices. We briefly analyze the different limitations in space or ground-based observations, as well as the issue of manufacturing the device. We also discuss several ways to improve the detection of a faint companion around a bright object. We conclude that, with respect to previous techniques, an instrument equipped with this coronagraph should have better performance and even enable the imaging of extrasolar giant planets at a young stage, when coupled with additional cleaning techniques.
Meemon, Panomsak; Rolland, Jannick P.
2010-01-01
Phase-Resolved Doppler Optical Coherence Tomography (PR-DOCT) allows visualization and characterization of the location, direction, velocity, and profile of flow activity embedded in a static sample structure. The detectable Velocity Dynamic Range (VDR) of each particular PR-DOCT system is governed by a detectable Doppler phase shift, a flow angle, and an acquisition time interval used to determine the Doppler phase shift. In general, the lower boundary of the detectable Doppler phase shift is limited by the phase stability of the system, while the upper boundary is limited by the π phase ambiguity. For a given range of detectable Doppler phase shift, shortening the acquisition duration will increase not only the maximum detectable velocity but unfortunately also the minimum detectable velocity, which may lead to the invisibility of a slow flow. In this paper, we present an alternative acquisition scheme for PR-DOCT that extends the lower limit of the velocity dynamic range, while maintaining the maximum detectable velocity, hence increasing the overall VDR of PR-DOCT system. The essence of the approach is to implement a technique of multi-scale measurement to simultaneously acquire multiple VDRs in a single measurement. We demonstrate an example of implementation of the technique in a dual VDR DOCT, where two Doppler maps having different detectable VDRs were simultaneously detected, processed, and displayed in real time. One was a fixed VDR DOCT capable of measuring axial velocity of up to 10.9 mm/s without phase unwrapping. The other was a variable VDR DOCT capable of adjusting its detectable VDR to reveal slow flow information down to 11.3 μm/s. The technique is shown to effectively extend the overall detectable VDR of the PR-DOCT system. Examples of real time Doppler imaging of an African frog tadpole are demonstrated using the dual-VDR DOCT system. PMID:21258521
NASA Astrophysics Data System (ADS)
Malloy, Matt
2013-09-01
A comprehensive survey was sent to merchant and captive mask shops to gather information about the mask industry as an objective assessment of its overall condition. 2013 marks the 12th consecutive year for this process. Historical topics including general mask profile, mask processing, data and write time, yield and yield loss, delivery times, maintenance, and returns were included and new topics were added. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the mask industry. While each year's survey includes minor updates based on feedback from past years and the need to collect additional data on key topics, the bulk of the survey and reporting structure have remained relatively constant. A series of improvements is being phased in beginning in 2013 to add value to a wider audience, while at the same time retaining the historical content required for trend analyses of the traditional metrics. Additions in 2013 include topics such as top challenges, future concerns, and additional details in key aspects of mask masking, such as the number of masks per mask set per ground rule, minimum mask resolution shipped, and yield by ground rule. These expansions beyond the historical topics are aimed at identifying common issues, gaps, and needs. They will also provide a better understanding of real-life mask requirements and capabilities for comparison to the International Technology Roadmap for Semiconductors (ITRS).
Erkert, Hans G; Fernandez-Duque, Eduardo; Rotundo, Marcelo; Scheideler, Angelika
2012-07-01
Among the more than 40 genera of anthropoid primates (monkeys, apes, and humans), only the South American owl monkeys, genus Aotus, are nocturnal. However, the southernmostly distributed species, Aotus azarai azarai, of the Gran Chaco may show considerable amounts of its 24-h activity during bright daylight. Due to seasonal changes in the duration of photophase and climatic parameters in their subtropical habitat, the timing and pattern of their daily activity are expected to show significant seasonal variation. By quantitative long-term activity recordings with Actiwatch AW4 accelerometer data logger devices of 10 wild owl monkeys inhabiting a gallery forest in Formosa, Argentina, the authors analyzed the seasonal variation in the temporal niche and activity pattern resulting from entrainment and masking of the circadian activity rhythm by seasonally and diurnally varying environmental factors. The owl monkeys always displayed a distinct bimodal activity pattern, with prominent activity bouts and peaks during dusk and dawn. Their activity rhythm showed distinct lunar and seasonal variations in the timing and daily pattern. During the summer, the monkeys showed predominantly crepuscular/nocturnal behavior, and a crepuscular/cathemeral activity pattern with similar diurnal and nocturnal activity levels during the cold winter months. The peak times of the evening and morning activity bouts were more closely related to the times of sunset and sunrise, respectively, than activity-onset and -offset. Obviously, they were better circadian markers for the phase position of the entrained activity rhythm than activity-onset and -offset, which were subject to more masking effects of environmental and/or internal factors. Total daily activity was lowest during the two coldest lunar months, and almost twice as high during the warmest months. Nighttime (21:00-06:00 h) and daytime (09:00-18:00 h) activity varied significantly across the year, but in an opposite manner. Highest nighttime activity occurred in summer and maximal daytime activity during the cold winter months. Dusk and dawn activity, which together accounted for 43% of the total daily activity, barely changed. The monkeys tended to terminate their nightly activity period earlier on warm and rainy days, whereas the daily amount of activity showed no significant correlation either with temperature or precipitation. These data are consistent with the dual-oscillator hypothesis of circadian regulation. They suggest the seasonal variations of the timing and pattern of daily activity in wild owl monkeys of the Argentinean Chaco result from a specific interplay of light entrainment of circadian rhythmicity and strong masking effects of various endogenous and environmental factors. Since the phase position of the monkeys' evening and morning activity peaks did not vary considerably over the year, the seasonal change from a crepuscular/nocturnal activity pattern in summer to a more crepuscular/cathemeral one in winter does not depend on a corresponding phase shift of the entrained circadian rhythm, but mainly on masking effects. Thermoregulatory and energetic demands and constraints seem to play a crucial role.
Perea, Manuel; Gómez, Pablo; Fraga, Isabel
2010-06-01
The pattern of masked repetition priming effects for word and nonword targets differs across tasks: Masked-priming effects in lexical decision occur for positive responses (i.e., words), but not for negative responses (nonwords), whereas masked-priming effects in the cross-case same-different task occur for positive responses (same), but not for negative responses (different)--regardless of lexical status. Here, we examined whether masked nonword priming effects are greater when the task involves an active go response to nonwords than when it involves the standard yes/no procedure in lexical decision. The obtained masked repetition priming effect for nonwords was of similar size in yes/no and go/no-go tasks. This finding is compatible with accounts of nonword priming that posit that nonword responses are produced by actively accumulating evidence for the nonword alternative in yes/no and go/no-go procedures, whereas it is inconsistent with the assumption of a deadline for no responses in the yes/no task.
Increasing the information acquisition volume in iris recognition systems.
Barwick, D Shane
2008-09-10
A significant hurdle for the widespread adoption of iris recognition in security applications is that the typically small imaging volume for eye placement results in systems that are not user friendly. Separable cubic phase plates at the lens pupil have been shown to ameliorate this disadvantage by increasing the depth of field. However, these phase masks have limitations on how efficiently they can capture the information-bearing spatial frequencies in iris images. The performance gains in information acquisition that can be achieved by more general, nonseparable phase masks is demonstrated. A detailed design method is presented, and simulations using representative designs allow for performance comparisons.
Three-dimensional rearrangement of single atoms using actively controlled optical microtraps.
Lee, Woojun; Kim, Hyosub; Ahn, Jaewook
2016-05-02
We propose and demonstrate three-dimensional rearrangements of single atoms. In experiments performed with single 87Rb atoms in optical microtraps actively controlled by a spatial light modulator, we demonstrate various dynamic rearrangements of up to N = 9 atoms including rotation, 2D vacancy filling, guiding, compactification, and 3D shuffling. With the capability of a phase-only Fourier mask to generate arbitrary shapes of the holographic microtraps, it was possible to place single atoms at arbitrary geometries of a few μm size and even continuously reconfigure them by conveying each atom. For this purpose, we loaded a series of computer-generated phase masks in the full frame rate of 60 Hz of the spatial light modulator, so the animation of phase mask transformed the holographic microtraps in real time, driving each atom along the assigned trajectory. Possible applications of this method of transformation of single atoms include preparation of scalable quantum platforms for quantum computation, quantum simulation, and quantum many-body physics.
Four-quadrant gratings moiré fringe alignment measurement in proximity lithography.
Zhu, Jiangping; Hu, Song; Yu, Junsheng; Zhou, Shaolin; Tang, Yan; Zhong, Min; Zhao, Lixin; Chen, Minyong; Li, Lanlan; He, Yu; Jiang, Wei
2013-02-11
This paper aims to deal with a four-quadrant gratings alignment method benefiting from phase demodulation for proximity lithography, which combines the advantages of interferometry with image processing. Both the mask alignment mark and the wafer alignment mark consist of four sets of gratings, which bring the convenience and simplification of realization for coarse alignment and fine alignment. Four sets of moiré fringes created by superposing the mask alignment mark and the wafer alignment mark are highly sensitive to the misalignment between them. And the misalignment can be easily determined through demodulating the phase of moiré fringe without any external reference. Especially, the period and phase distribution of moiré fringes are unaffected by the gap between the mask and the wafer, not excepting the wavelength of alignment illumination. Disturbance from the illumination can also be negligible, which enhances the technological adaptability. The experimental results bear out the feasibility and rationality of our designed approach.
LaDou, Joseph
1982-01-01
More than 13.5 million American workers, close to 20 percent of the work force, are assigned to evening or night shifts. In some industries such as automobile, petrochemical and textile manufacturing the proportion of shift workers is greater than 50 percent. As the popularity of shift work and other “alternative work schedules” grows, concern is increasing over the disturbance created in the lives of workers and their families by these economically and socially useful innovations. Twenty percent of workers are unable to tolerate shift work. Daily physiologic variations termed circadian rhythms are interactive and require a high degree of phase relationship to produce subjective feelings of wellbeing. Disturbance of these activities, circadian desynchronization, whether from passage over time zones or from shift rotation, results in health effects such as disturbance of the quantity and quality of sleep, disturbance of gastrointestinal and other organ system activities, and aggravation of diseases such as diabetes mellitus, epilepsy and thyrotoxicosis. Worker selection can reduce the number of health problems resulting from shift work. The periodic examination of shift workers is recommended. PMID:6962577
Allely, Rebekah R; Van-Buendia, Lan B; Jeng, James C; White, Patricia; Wu, Jingshu; Niszczak, Jonathan; Jordan, Marion H
2008-01-01
A paradigm shift in management of postburn facial scarring is lurking "just beneath the waves" with the widespread availability of two recent technologies: precise three-dimensional scanning/digitizing of complex surfaces and computer-controlled rapid prototyping three-dimensional "printers". Laser Doppler imaging may be the sensible method to track the scar hyperemia that should form the basis of assessing progress and directing incremental changes in the digitized topographical face mask "prescription". The purpose of this study was to establish feasibility of detecting perfusion through transparent face masks using the Laser Doppler Imaging scanner. Laser Doppler images of perfusion were obtained at multiple facial regions on five uninjured staff members. Images were obtained without a mask, followed by images with a loose fitting mask with and without a silicone liner, and then with a tight fitting mask with and without a silicone liner. Right and left oblique images, in addition to the frontal images, were used to overcome unobtainable measurements at the extremes of face mask curvature. General linear model, mixed model, and t tests were used for data analysis. Three hundred seventy-five measurements were used for analysis, with a mean perfusion unit of 299 and pixel validity of 97%. The effect of face mask pressure with and without the silicone liner was readily quantified with significant changes in mean cutaneous blood flow (P < .5). High valid pixel rate laser Doppler imager flow data can be obtained through transparent face masks. Perfusion decreases with the application of pressure and with silicone. Every participant measured differently in perfusion units; however, consistent perfusion patterns in the face were observed.
Considerations of digital phase modulation for narrowband satellite mobile communication
NASA Technical Reports Server (NTRS)
Grythe, Knut
1990-01-01
The Inmarsat-M system for mobile satellite communication is specified as a frequency division multiple access (FDMA) system, applying Offset Quadrature Phase Shift Keying (QPSK) for transmitting 8 kbit/sec in 10 kHz user channel bandwidth. We consider Digital Phase Modulation (DPM) as an alternative modulation format for INMARSAT-M. DPM is similar to Continuous Phase Modulation (CPM) except that DPM has a finite memory in the premodular filter with a continuous varying modulation index. It is shown that DPM with 64 states in the VA obtains a lower bit error rate (BER). Results for a 5 kHz system, with the same 8 kbit/sec transmitted bitstream, is also presented.
DOT National Transportation Integrated Search
1980-10-01
This report describes the methods used in the evaluation of a new continuous-flow, phase-dilution passenger oxygen mask for compliance to FAA technical Standard Order (TSO)-C64 requirements. Data presented include end expiratory partial pressures for...
Sivaprasad, Sobha; Arden, Geoffrey; Prevost, A Toby; Crosby-Nwaobi, Roxanne; Holmes, Helen; Kelly, Joanna; Murphy, Caroline; Rubin, Gary; Vasconcelos, Joanna; Hykin, Philip
2014-11-22
This study will evaluate hypoxia, as a novel concept in the pathogenesis of diabetic macular oedema (DMO). As the oxygen demand of the eye is maximum during dark-adaptation, we hypothesize that wearing light-masks during sleep will cause regression and prevent the development and progression of DMO. The study protocol comprises both an efficacy and mechanistic evaluation to test this hypothesis. This is a phase III randomised controlled single-masked multicentre clinical trial to test the clinical efficacy of light-masks at preventing dark-adaptation in the treatment of non-central DMO. Three hundred patients with non-centre-involving DMO in at least one eye will be randomised 1:1 to light-masks and control masks (with no light) to be used during sleep at night for a period of 24 months. The primary outcome is regression of non-central oedema by assessing change in the zone of maximal retinal thickness at baseline on optical coherence tomography (SD-OCT). Secondary outcomes will evaluate the prevention of development and progression of DMO by assessing changes in retinal thickness in different regions of the macula, macular volume, refracted visual acuity and level of retinopathy. Safety parameters will include sleep disturbance. Adverse events and measures of compliance will be assessed over 24 months. Participants recruited to the mechanistic sub-study will have additional retinal oximetry, multifocal electroretinography (ERG) and microperimetry to evaluate the role of hypoxia by assessing and comparing changes induced by supplemental oxygen and the light-masks at 12 months. The outcomes of this study will provide insight into the pathogenesis of DMO and provide evidence on whether a simple, non-invasive device in the form of a light-mask can help prevent the progression to centre-involving DMO and visual impairment in people with diabetes.
Finneran, James J; Schlundt, Carolyn E; Dear, Randall; Carder, Donald A; Ridgway, Sam H
2002-06-01
A behavioral response paradigm was used to measure masked underwater hearing thresholds in a bottlenose dolphin (Tursiops truncatus) and a white whale (Delphinapterus leucas) before and after exposure to single underwater impulsive sounds produced from a seismic watergun. Pre- and postexposure thresholds were compared to determine if a temporary shift in masked hearing thresholds (MTTS), defined as a 6-dB or larger increase in postexposure thresholds, occurred. Hearing thresholds were measured at 0.4, 4, and 30 kHz. MTTSs of 7 and 6 dB were observed in the white whale at 0.4 and 30 kHz, respectively, approximately 2 min following exposure to single impulses with peak pressures of 160 kPa, peak-to-peak pressures of 226 dB re 1 microPa, and total energy fluxes of 186 dB re 1 microPa2 x s. Thresholds returned to within 2 dB of the preexposure value approximately 4 min after exposure. No MTTS was observed in the dolphin at the highest exposure conditions: 207 kPa peak pressure, 228 dB re 1 microPa peak-to-peak pressure, and 188 dB re 1 microPa2 x s total energy flux.
NASA Astrophysics Data System (ADS)
Shi, Cheng; Liu, Fang; Li, Ling-Ling; Hao, Hong-Xia
2014-01-01
The goal of pan-sharpening is to get an image with higher spatial resolution and better spectral information. However, the resolution of the pan-sharpened image is seriously affected by the thin clouds. For a single image, filtering algorithms are widely used to remove clouds. These kinds of methods can remove clouds effectively, but the detail lost in the cloud removal image is also serious. To solve this problem, a pan-sharpening algorithm to remove thin cloud via mask dodging and nonsampled shift-invariant shearlet transform (NSST) is proposed. For the low-resolution multispectral (LR MS) and high-resolution panchromatic images with thin clouds, a mask dodging method is used to remove clouds. For the cloud removal LR MS image, an adaptive principal component analysis transform is proposed to balance the spectral information and spatial resolution in the pan-sharpened image. Since the clouds removal process causes the detail loss problem, a weight matrix is designed to enhance the details of the cloud regions in the pan-sharpening process, but noncloud regions remain unchanged. And the details of the image are obtained by NSST. Experimental results over visible and evaluation metrics demonstrate that the proposed method can keep better spectral information and spatial resolution, especially for the images with thin clouds.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Hou, Guangjin, E-mail: hou@udel.edu, E-mail: tpolenov@udel.edu; Lu, Xingyu, E-mail: luxingyu@udel.edu, E-mail: lexvega@comcast.net; Vega, Alexander J., E-mail: luxingyu@udel.edu, E-mail: lexvega@comcast.net
2014-09-14
We report a Phase-Alternating R-Symmetry (PARS) dipolar recoupling scheme for accurate measurement of heteronuclear {sup 1}H-X (X = {sup 13}C, {sup 15}N, {sup 31}P, etc.) dipolar couplings in MAS NMR experiments. It is an improvement of conventional C- and R-symmetry type DIPSHIFT experiments where, in addition to the dipolar interaction, the {sup 1}H CSA interaction persists and thereby introduces considerable errors in the dipolar measurements. In PARS, phase-shifted RN symmetry pulse blocks applied on the {sup 1}H spins combined with π pulses applied on the X spins at the end of each RN block efficiently suppress the effect from {supmore » 1}H chemical shift anisotropy, while keeping the {sup 1}H-X dipolar couplings intact. Another advantage over conventional DIPSHIFT experiments, which require the signal to be detected in the form of a reduced-intensity Hahn echo, is that the series of π pulses refocuses the X chemical shift and avoids the necessity of echo formation. PARS permits determination of accurate dipolar couplings in a single experiment; it is suitable for a wide range of MAS conditions including both slow and fast MAS frequencies; and it assures dipolar truncation from the remote protons. The performance of PARS is tested on two model systems, [{sup 15}N]-N-acetyl-valine and [U-{sup 13}C,{sup 15}N]-N-formyl-Met-Leu-Phe tripeptide. The application of PARS for site-resolved measurement of accurate {sup 1}H-{sup 15}N dipolar couplings in the context of 3D experiments is presented on U-{sup 13}C,{sup 15}N-enriched dynein light chain protein LC8.« less
Simpler Alternative to an Optimum FQPSK-B Viterbi Receiver
NASA Technical Reports Server (NTRS)
Lee, Dennis; Simon, Marvin; Yan, Tsun-Yee
2003-01-01
A reduced-complexity alternative to an optimum FQPSK-B Viterbi receiver has been invented. As described, the reduction in complexity is achieved at the cost of only a small reduction in power performance [performance expressed in terms of a bit-energy-to-noise-energy ratio (Eb/N0) for a given bit-error rate (BER)]. The term "FQPSK-B" denotes a baseband-filtered version of Feher quadrature-phase-shift keying, which is a patented, bandwidth-efficient phase-modulation scheme named after its inventor. Heretofore, commercial FQPSK-B receivers have performed symbol-by-symbol detection, in each case using a detection filter (either the proprietary FQPSK-B filter for better BER performance, or a simple integrate-and-dump filter with degraded performance) and a sample-and-hold circuit.
NASA Technical Reports Server (NTRS)
Remeer, Lorraine A.
2011-01-01
The MODIS aerosol cloud mask is based on a spatial variability test, using the assumption that aerosols are more homogeneous than clouds. On top of this first line of defense are a series of additional tests based on threshold values and ratios of various MODIS channels. The goal is to eliminate clouds and keep the aerosol. How well have we succeeded? There have been several studies showing cloud contamination in the MODIS aerosol product and several alternative cloud masks proposed. There are even "competing" MODIS aerosol products that offer an alternative "cloud free" world. Are these alternative products an improvement to the old standard product? We find there is a trade-off between retrieval availability and cloud contamination, and for many applications it is better to have a little bit of cloud in the product than to not have enough product. I will review the decisions that led us to the present MODIS cloud mask, and show how it is simultaneously too liberal and too conservative, some ideas on how to make it better and why in the end it doesn't matter. I hope to inspire a spirited discussion and will be very willing to take your complaints and suggestions.
A prototype urine collection device for female aircrew
NASA Technical Reports Server (NTRS)
Bisson, Roger U.; Delger, Karlyna L.
1993-01-01
Women are gaining increased access to small military cockpits. This shift has stimulated the search for practical urine containment and disposal methods for female aircrew. There are no external urine collection devices (UCD) for women that are comfortable, convenient, and leak free. We describe a prototype UCD that begins to meet this need. Materials used to make custom aviator masks were adapted to mold a perineal mask. First, a perineal cast (negative) was used to make a mold (positive). Next, a perineal mask made of wax was formed to fit the positive mold. Finally, a soft, pliable perineal mask was fabricated using the wax model as a guide. The prototype was tested for comfort, fit, and leakage. In the sitting position, less than 5 cc of urine leakage occurred with each 600 cc of urine collected. Comfort was mostly satisfactory, but ambulation was limited and the outlet design could lead to kinking and obstruction. We concluded that a perineal mask may serve as a comfortable and functional external UCD acceptable for use by females in confined environments. Changes are needed to improve comfort, fit, and urine drainage. Integration into cockpits, pressure suits, chemical defense gear, and environments where access to relief facilities is restricted is planned.
Method and apparatus for monitoring and measuring the surface tension of a fluid using fiber optics
Abraham, Bernard M.; Ketterson, John B.; Bohanon, Thomas M.; Mikrut, John M.
1994-01-01
A non-contact method and apparatus for measuring and monitoring the surface of a fluid using fiber optics and interferometric detection to permit measurement mechanical characteristics' fluid surfaces. The apparatus employs an alternating electric field gradient for generating a capillary wave on the surface of the fluid. A fiber optic coupler and optical fiber directs a portion of a laser beam onto the surface of the fluid, another portion of the laser beam onto the photo sensor, and directs light reflected from the surface of the fluid onto the photo sensor. The output of the photo sensor is processed and coupled to a phase sensitive detector to permit measurement of phase shift between the drive signal creating the capillary wave and the detected signal. This phase shift information is then used to determine mechanical properties of the fluid surface such as surface tension, surface elasticity, and surface inhomogeneity. The resulting test structure is easily made compact, portable, and easy to align and use.
Guo, Hao; Wang, Ziming; Du, Quanyin; Li, Pan; Wang, Zhigang; Wang, Aimin
2017-01-01
Bacterial biofilms on the surface of prostheses are becoming a rising concern in managing prosthetic joint infections. The inherent resistant features of biofilms render traditional antimicrobial therapy unproductive and revision surgery outcomes uncertain. This situation has prompted the exploration of novel antimicrobial strategies. The synergy of ultrasound microbubbles and vancomycin has been proposed as an efficient alternative for biofilm eradication. The purpose of this study was to evaluate the anti-biofilm effect of stimulated phase-shift acoustic nanodroplets (NDs) combined with vancomycin. We fabricated lipid phase-shift NDs with a core of liquid perfluoropentane. A new phase change mode for NDs incorporating an initial unfocused low-intensity pulsed ultrasound for 5 minutes and a subsequent incubation at 37°C into a 24-hour duration was developed. Methicillin-resistant Staphylococcus aureus (MRSA) biofilms were incubated with vancomycin and NDs under the hybrid stimulation. Biofilm morphology following treatment was determined using confocal laser scanning microscopy and scanning electron microscopy. Resazurin assay was used to quantify bactericidal efficacy against MRSA biofilm bacteria. NDs treated sequentially with ultrasound and heating at 37°C achieved gradual and substantial ND vaporization and cavitation in a successive process. NDs after stimulation were capable of generating stronger destruction on biofilm structure which was best characterized by residual circular arc margins and more dead bacteria. Furthermore, NDs combined with vancomycin contributed to significantly decreasing the metabolic activity of bacteria in MRSA biofilms ( P <0.05). Phase-shift acoustic NDs could exert a significant bactericidal effect against MRSA biofilms through a new stimulation mode. Acoustic NDs present advantages over microbubbles for biofilm damage. This anti-biofilm strategy could be used either alone or as an enhancer of traditional antibiotics in the control of prosthetic joint infections.
Anomalous Refraction of Acoustic Guided Waves in Solids with Geometrically Tapered Metasurfaces.
Zhu, Hongfei; Semperlotti, Fabio
2016-07-15
The concept of a metasurface opens new exciting directions to engineer the refraction properties in both optical and acoustic media. Metasurfaces are typically designed by assembling arrays of subwavelength anisotropic scatterers able to mold incoming wave fronts in rather unconventional ways. The concept of a metasurface was pioneered in photonics and later extended to acoustics while its application to the propagation of elastic waves in solids is still relatively unexplored. We investigate the design of acoustic metasurfaces to control elastic guided waves in thin-walled structural elements. These engineered discontinuities enable the anomalous refraction of guided wave modes according to the generalized Snell's law. The metasurfaces are made out of locally resonant toruslike tapers enabling an accurate phase shift of the incoming wave, which ultimately affects the refraction properties. We show that anomalous refraction can be achieved on transmitted antisymmetric modes (A_{0}) either when using a symmetric (S_{0}) or antisymmetric (A_{0}) incident wave, the former clearly involving mode conversion. The same metasurface design also allows achieving structure embedded planar focal lenses and phase masks for nonparaxial propagation.
Liquid-crystal projection image depixelization by spatial phase scrambling
NASA Astrophysics Data System (ADS)
Yang, Xiangyang; Jutamulia, Suganda; Li, Nan
1996-08-01
A technique that removes the pixel structure by scrambling the relative phases among multiple spatial spectra is described. Because of the pixel structure of the liquid-crystal-display (LCD) panel, multiple spectra are generated at the Fourier-spectrum plane (usually at the back focal plane of the imaging lens). A transparent phase mask is placed at the Fourier-spectrum plane such that each spectral order is modulated by one of the subareas of the phase mask, and the phase delay resulting from each pair of subareas is longer than the coherent length of the light source, which is approximately 1 m for the wideband white light sources used in most of LCD s. Such a phase-scrambling technique eliminates the coherence between different spectral orders; therefore, the reconstructed images from the multiple spectra will superimpose incoherently, and the pixel structure will not be observed in the projection image.
Bang, Abhay T; Bang, Rani A; Baitule, Sanjay B; Reddy, Hanimi M; Deshmukh, Mahesh D
2005-03-01
To evaluate the effect of home-based neonatal care on birth asphyxia and to compare the effectiveness of two types of workers and three methods of resuscitation in home delivery. In a field trial of home-based neonatal care in rural Gadchiroli, India, birth asphyxia in home deliveries was managed differently during different phases. Trained traditional birth attendants (TBA) used mouth-to-mouth resuscitation in the baseline years (1993 to 1995). Additional village health workers (VHWs) only observed in 1995 to 1996. In the intervention years (1996 to 2003), they used tube-mask (1996 to 1999) and bag-mask (1999 to 2003). The incidence, case fatality (CF) and asphyxia-specific mortality rate (ASMR) during different phases were compared. During the intervention years, 5033 home deliveries occurred. VHWs were present during 84% home deliveries. The incidence of mild birth asphyxia decreased by 60%, from 14% in the observation year (1995 to 1996) to 6% in the intervention years (p<0.0001). The incidence of severe asphyxia did not change significantly, but the CF in neonates with severe asphyxia decreased by 47.5%, from 39 to 20% (p<0.07) and ASMR by 65%, from 11 to 4% (p<0.02). Mouth-to-mouth resuscitation reduced the ASMR by 12%, tube-mask further reduced the CF by 27% and the ASMR by 67%. The bag-mask showed an additional decrease in CF of 39% and in the fresh stillbirth rate of 33% in comparison to tube-mask (not significant). The cost of bag and mask was US dollars 13 per averted death. Oxytocic injection administered by unqualified doctors showed an odds ratio of three for the occurrence of severe asphyxia or fresh stillbirth. Home-based interventions delivered by a team of TBA and a semiskilled VHW reduced the asphyxia-related neonatal mortality by 65% compared to only TBA. The bag-mask appears to be superior to tube-mask or mouth-to-mouth resuscitation, with an estimated equipment cost of US dollars 13 per death averted.
Vortex Mask: Making 80nm contacts with a twist!
NASA Astrophysics Data System (ADS)
Levenson, Marc D.; Dai, Grace; Ebihara, Takeaki
2002-12-01
An optical vortex has a phase that spirals like a corkscrew. Since any nonzero optical amplitude must have a well-defined phase, the axis of a vortex (where the phase is undefined) is always dark. Printed in negative resist, lowest order vortices would produce contact holes with 0.2
NASA Astrophysics Data System (ADS)
Verevkin, Yu K.; Klimov, A. Yu; Gribkov, B. A.; Petryakov, V. N.; Koposova, E. V.; Olaizola, Santiago M.
2008-11-01
By using the interference of pulsed radiation and a complete lithographic cycle, phase masks on quartz and antireflection structures on quartz and silicon are produced. The transmission of radiation through a corrugated vacuum—solid interface is calculated by solving rigorously an integral equation with the help of a computer program for parameters close to experimental parameters. The results of measurements are in good agreement with calculations. The methods developed in the paper can be used for manufacturing optical and semiconductor devices.
Features of Talbot effect on phase diffraction grating
NASA Astrophysics Data System (ADS)
Brazhnikov, Denis G.; Danko, Volodymyr P.; Kotov, Myhaylo M.; Kovalenko, Andriy V.
2018-01-01
The features of the Talbot effect using the phase diffraction gratings have been considered. A phase grating, unlike an amplitude grating, gives a constant light intensity in the observation plane at a distance multiple to half of the Talbot length ZT. In this case, the subject of interest consists in so-called fractional Talbot effect with the periodic intensity distribution observed in planes shifted from the position nZT/2 (the so-called Fresnel images). Binary phase diffraction gratings with varying phase steps have been investigated. Gratings were made photographically on holographic plates PFG-01. The phase shift was obtained by modulating the emulsion refraction index of the plates. Two types of gratings were used: a square grating with a fill factor of 0.5 and a checkerwise grating (square areas with a bigger and lower refractive index alternate in a checkerboard pattern). By the example of these gratings, the possibility of obtaining in the observation plane an image of a set of equidistant spots with a size smaller than the size of the phase-shifting elements of the grating (the so-called Talbot focusing) has been shown. Clear images of spots with a sufficient signal-to-noise ratio have been obtained for a square grating. Their period was equal to the period of the grating. For a grating with a checkerwise distribution of the refractive index, the spots have been located in positions corresponding to the centres of cells. In addition, the quality of the resulting pattern strongly depended on the magnitude of a grating phase step. As a result of the work, the possibility to obtain Talbot focusing has been shown and the use of this effect to wavefront investigation with a gradient sensor has been demonstrated.
Ion track etching revisited: II. Electronic properties of aged tracks in polymers
NASA Astrophysics Data System (ADS)
Fink, D.; Muñoz Hernández, G.; Cruz, S. A.; Garcia-Arellano, H.; Vacik, J.; Hnatowicz, V.; Kiv, A.; Alfonta, L.
2018-02-01
We compile here electronic ion track etching effects, such as capacitive-type currents, current spike emission, phase shift, rectification and background currents that eventually emerge upon application of sinusoidal alternating voltages across thin, aged swift heavy ion-irradiated polymer foils during etching. Both capacitive-type currents and current spike emission occur as long as obstacles still prevent a smooth continuous charge carrier passage across the foils. In the case of sufficiently high applied electric fields, these obstacles are overcome by spike emission. These effects vanish upon etchant breakthrough. Subsequent transmitted currents are usually of Ohmic type, but shortly after breakthrough (during the track' core etching) often still exhibit deviations such as strong positive phase shifts. They stem from very slow charge carrier mobility across the etched ion tracks due to retarding trapping/detrapping processes. Upon etching the track's penumbra, one occasionally observes a split-up into two transmitted current components, one with positive and another one with negative phase shifts. Usually, these phase shifts vanish when bulk etching starts. Current rectification upon track etching is a very frequent phenomenon. Rectification uses to inverse when core etching ends and penumbra etching begins. When the latter ends, rectification largely vanishes. Occasionally, some residual rectification remains which we attribute to the aged polymeric bulk itself. Last not least, we still consider background currents which often emerge transiently during track etching. We could assign them clearly to differences in the electrochemical potential of the liquids on both sides of the etched polymer foils. Transient relaxation effects during the track etching cause their eventually chaotic behaviour.
A finite state machine read-out chip for integrated surface acoustic wave sensors
NASA Astrophysics Data System (ADS)
Rakshit, Sambarta; Iliadis, Agis A.
2015-01-01
A finite state machine based integrated sensor circuit suitable for the read-out module of a monolithically integrated SAW sensor on Si is reported. The primary sensor closed loop consists of a voltage controlled oscillator (VCO), a peak detecting comparator, a finite state machine (FSM), and a monolithically integrated SAW sensor device. The output of the system oscillates within a narrow voltage range that correlates with the SAW pass-band response. The period of oscillation is of the order of the SAW phase delay. We use timing information from the FSM to convert SAW phase delay to an on-chip 10 bit digital output operating on the principle of time to digital conversion (TDC). The control inputs of this digital conversion block are generated by a second finite state machine operating under a divided system clock. The average output varies with changes in SAW center frequency, thus tracking mass sensing events in real time. Based on measured VCO gain of 16 MHz/V our system will convert a 10 kHz SAW frequency shift to a corresponding mean voltage shift of 0.7 mV. A corresponding shift in phase delay is converted to a one or two bit shift in the TDC output code. The system can handle alternate SAW center frequencies and group delays simply by adjusting the VCO control and TDC delay control inputs. Because of frequency to voltage and phase to digital conversion, this topology does not require external frequency counter setups and is uniquely suitable for full monolithic integration of autonomous sensor systems and tags.
Binaural Release from Masking for a Speech Sound in Infants, Preschoolers, and Adults.
ERIC Educational Resources Information Center
Nozza, Robert J.
1988-01-01
Binaural masked thresholds for a speech sound (/ba/) were estimated under two interaural phase conditions in three age groups (infants, preschoolers, adults). Differences as a function of both age and condition and effects of reducing intensity for adults were significant in indicating possible developmental binaural hearing changes, especially…
Modeling of intense pulsed ion beam heated masked targets for extreme materials characterization
Barnard, John J.; Schenkel, Thomas
2017-11-15
Intense, pulsed ion beams locally heat materials and deliver dense electronic excitations that can induce material modifications and phase transitions. Material properties can potentially be stabilized by rapid quenching. Pulsed ion beams with pulse lengths of order ns have recently become available for materials processing. Here, we optimize mask geometries for local modification of materials by intense ion pulses. The goal is to rapidly excite targets volumetrically to the point where a phase transition or local lattice reconstruction is induced followed by rapid cooling that stabilizes desired material's properties fast enough before the target is altered or damaged by, e.g.,more » hydrodynamic expansion. By using a mask, the longitudinal dimension can be large compared to the transverse dimension, allowing the possibility of rapid transverse cooling. We performed HYDRA simulations that calculate peak temperatures for a series of excitation conditions and cooling rates of silicon targets with micro-structured masks and compare these to a simple analytical model. In conclusion, the model gives scaling laws that can guide the design of targets over a wide range of pulsed ion beam parameters.« less
Modeling of intense pulsed ion beam heated masked targets for extreme materials characterization
NASA Astrophysics Data System (ADS)
Barnard, John J.; Schenkel, Thomas
2017-11-01
Intense, pulsed ion beams locally heat materials and deliver dense electronic excitations that can induce material modifications and phase transitions. Material properties can potentially be stabilized by rapid quenching. Pulsed ion beams with pulse lengths of order ns have recently become available for materials processing. Here, we optimize mask geometries for local modification of materials by intense ion pulses. The goal is to rapidly excite targets volumetrically to the point where a phase transition or local lattice reconstruction is induced followed by rapid cooling that stabilizes desired material's properties fast enough before the target is altered or damaged by, e.g., hydrodynamic expansion. By using a mask, the longitudinal dimension can be large compared to the transverse dimension, allowing the possibility of rapid transverse cooling. We performed HYDRA simulations that calculate peak temperatures for a series of excitation conditions and cooling rates of silicon targets with micro-structured masks and compare these to a simple analytical model. The model gives scaling laws that can guide the design of targets over a wide range of pulsed ion beam parameters.
Sivaprasad, Sobha; Vasconcelos, Joana C; Prevost, A Toby; Holmes, Helen; Hykin, Philip; George, Sheena; Murphy, Caroline; Kelly, Joanna; Arden, Geoffrey B
2018-05-01
We aimed to assess 24-month outcomes of wearing an organic light-emitting sleep mask as an intervention to treat and prevent progression of non-central diabetic macular oedema. CLEOPATRA was a phase 3, single-blind, parallel-group, randomised controlled trial undertaken at 15 ophthalmic centres in the UK. Adults with non-centre-involving diabetic macular oedema were randomly assigned (1:1) to wearing either a light mask during sleep (Noctura 400 Sleep Mask, PolyPhotonix Medical, Sedgefield, UK) or a sham (non-light) mask, for 24 months. Randomisation was by minimisation generated by a central web-based computer system. Outcome assessors were masked technicians and optometrists. The primary outcome was the change in maximum retinal thickness on optical coherence tomography (OCT) at 24 months, analysed using a linear mixed-effects model incorporating 4-monthly measurements and baseline adjustment. Analysis was done using the intention-to-treat principle in all randomised patients with OCT data. Safety was assessed in all patients. This trial is registered with Controlled-Trials.com, number ISRCTN85596558. Between April 10, 2014, and June 15, 2015, 308 patients were randomly assigned to wearing the light mask (n=155) or a sham mask (n=153). 277 patients (144 assigned the light mask and 133 the sham mask) contributed to the mixed-effects model over time, including 246 patients with OCT data at 24 months. The change in maximum retinal thickness at 24 months did not differ between treatment groups (mean change -9·2 μm [SE 2·5] for the light mask vs -12·9 μm [SE 2·9] for the sham mask; adjusted mean difference -0·65 μm, 95% CI -6·90 to 5·59; p=0·84). Median compliance with wearing the light mask at 24 months was 19·5% (IQR 1·9-51·6). No serious adverse events were related to either mask. The most frequent adverse events related to the assigned treatment were discomfort on the eyes (14 with the light mask vs seven with the sham mask), painful, sticky, or watery eyes (14 vs six), and sleep disturbance (seven vs one). The light mask as used in this study did not confer long-term therapeutic benefit on non-centre-involving diabetic macular oedema and the study does not support its use for this indication. The Efficacy and Mechanism Evaluation Programme, a Medical Research Council and National Institute for Health Research partnership. Copyright © 2018 The Author(s). Published by Elsevier Ltd. This is an Open Access article under the CC BY 4.0 license. Published by Elsevier Ltd.. All rights reserved.
Model-based assist feature insertion for sub-40nm memory device
NASA Astrophysics Data System (ADS)
Suh, Sungsoo; Lee, Suk-joo; Choi, Seong-woon; Lee, Sung-Woo; Park, Chan-hoon
2009-04-01
Many issues need to be resolved for a production-worthy model based assist feature insertion flow for single and double exposure patterning process to extend low k1 process at 193 nm immersion technology. Model based assist feature insertion is not trivial to implement either for single and double exposure patterning compared to rule based methods. As shown in Fig. 1, pixel based mask inversion technology in itself has difficulties in mask writing and inspection although it presents as one of key technology to extend single exposure for contact layer. Thus far, inversion technology is tried as a cooptimization of target mask to simultaneously generate optimized main and sub-resolution assists features for a desired process window. Alternatively, its technology can also be used to optimize for a target feature after an assist feature types are inserted in order to simplify the mask complexity. Simplification of inversion mask is one of major issue with applying inversion technology to device development even if a smaller mask feature can be fabricated since the mask writing time is also a major factor. As shown in Figure 2, mask writing time may be a limiting factor in determining whether or not an inversion solution is viable. It can be reasoned that increased number of shot counts relates to increase in margin for inversion methodology. On the other hand, there is a limit on how complex a mask can be in order to be production worthy. There is also source and mask co-optimization which influences the final mask patterns and assist feature sizes and positions for a given target. In this study, we will discuss assist feature insertion methods for sub 40-nm technology.
Coherent diffractive imaging using randomly coded masks
Seaberg, Matthew H.; d'Aspremont, Alexandre; Turner, Joshua J.
2015-12-07
We experimentally demonstrate an extension to coherent diffractive imaging that encodes additional information through the use of a series of randomly coded masks, removing the need for typical object-domain constraints while guaranteeing a unique solution to the phase retrieval problem. Phase retrieval is performed using a numerical convex relaxation routine known as “PhaseCut,” an iterative algorithm known for its stability and for its ability to find the global solution, which can be found efficiently and which is robust to noise. As a result, the experiment is performed using a laser diode at 532.2 nm, enabling rapid prototyping for future X-raymore » synchrotron and even free electron laser experiments.« less
Coherent diffractive imaging using randomly coded masks
DOE Office of Scientific and Technical Information (OSTI.GOV)
Seaberg, Matthew H., E-mail: seaberg@slac.stanford.edu; Linac Coherent Light Source, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025; D'Aspremont, Alexandre
2015-12-07
We experimentally demonstrate an extension to coherent diffractive imaging that encodes additional information through the use of a series of randomly coded masks, removing the need for typical object-domain constraints while guaranteeing a unique solution to the phase retrieval problem. Phase retrieval is performed using a numerical convex relaxation routine known as “PhaseCut,” an iterative algorithm known for its stability and for its ability to find the global solution, which can be found efficiently and which is robust to noise. The experiment is performed using a laser diode at 532.2 nm, enabling rapid prototyping for future X-ray synchrotron and even freemore » electron laser experiments.« less
DOE Office of Scientific and Technical Information (OSTI.GOV)
Claus, Rene A.; Wang, Yow-Gwo; Wojdyla, Antoine
Extreme Ultraviolet (EUV) Lithography mask defects were examined on the actinic mask imaging system, SHARP, at Lawrence Berkeley National Laboratory. Also, a quantitative phase retrieval algorithm based on the Weak Object Transfer Function was applied to the measured through-focus aerial images to examine the amplitude and phase of the defects. The accuracy of the algorithm was demonstrated by comparing the results of measurements using a phase contrast zone plate and a standard zone plate. Using partially coherent illumination to measure frequencies that would otherwise fall outside the numerical aperture (NA), it was shown that some defects are smaller than themore » conventional resolution of the microscope. We found that the programmed defects of various sizes were measured and shown to have both an amplitude and a phase component that the algorithm is able to recover.« less
EUV mask pilot line at Intel Corporation
NASA Astrophysics Data System (ADS)
Stivers, Alan R.; Yan, Pei-Yang; Zhang, Guojing; Liang, Ted; Shu, Emily Y.; Tejnil, Edita; Lieberman, Barry; Nagpal, Rajesh; Hsia, Kangmin; Penn, Michael; Lo, Fu-Chang
2004-12-01
The introduction of extreme ultraviolet (EUV) lithography into high volume manufacturing requires the development of a new mask technology. In support of this, Intel Corporation has established a pilot line devoted to encountering and eliminating barriers to manufacturability of EUV masks. It concentrates on EUV-specific process modules and makes use of the captive standard photomask fabrication capability of Intel Corporation. The goal of the pilot line is to accelerate EUV mask development to intersect the 32nm technology node. This requires EUV mask technology to be comparable to standard photomask technology by the beginning of the silicon wafer process development phase for that technology node. The pilot line embodies Intel's strategy to lead EUV mask development in the areas of the mask patterning process, mask fabrication tools, the starting material (blanks) and the understanding of process interdependencies. The patterning process includes all steps from blank defect inspection through final pattern inspection and repair. We have specified and ordered the EUV-specific tools and most will be installed in 2004. We have worked with International Sematech and others to provide for the next generation of EUV-specific mask tools. Our process of record is run repeatedly to ensure its robustness. This primes the supply chain and collects information needed for blank improvement.
Using evidence-based medicine to protect healthcare workers from pandemic influenza: Is it possible?
Gralton, Jan; McLaws, Mary-Louise
2011-01-01
To use evidence-based principles to develop infection control algorithms to ensure the protection of healthcare workers and the continuity of health service provision during a pandemic. : Evidence-based algorithms were developed from published research as well as "needs and values" assessments. Research evidence was obtained from 97 studies reporting the protectiveness of antiviral prophylaxis, seasonal vaccination, and mask use. Needs and values assessments were undertaken by international experts in pandemic infection control and local healthcare workers. Opportunity and resources costs were not determined. The Australian government commissioned the development of an evidence-based algorithm for inclusion in the 2008 revision of the Australian Health and Management Plan for Pandemic Influenza. Two international infection control teams responsible for healthcare worker safety during the Severe Acute Respiratory Syndrome outbreak reviewed the evidence-based algorithms. The algorithms were then reviewed for needs and values by eight local clinicians who were considered key frontline clinicians during the contain and sustain phases. The international teams reviewed for practicability of implementation, whereas local clinicians reviewed for clinician compliance. Despite strong evidence for vaccination and antiviral prophylaxis providing significant protection, clinicians believed they required the additional combinations of both masks and face shields. Despite the equivocal evidence for the efficacy of surgical and N95 masks and the provision of algorithms appropriate for the level of risk according to clinical care during a pandemic, clinicians still demanded N95 masks plus face shields in combination with prophylaxis and novel vaccination. Conventional evidence-based principles could not be applied to formulate recommendations due to the lack of pandemic-specific efficacy data of protection tools and the inherent unpredictability of pandemics. As an alternative, evidence-based principles have been used to formulate recommendations while giving priority to the needs and values of healthcare workers over the research evidence.
Donges, Uta-Susan; Dukalski, Bibiana; Kersting, Anette; Suslow, Thomas
2015-01-01
Instability of affects and interpersonal relations are important features of borderline personality disorder (BPD). Interpersonal problems of individuals suffering from BPD might develop based on abnormalities in the processing of facial affects and high sensitivity to negative affective expressions. The aims of the present study were to examine automatic evaluative shifts and latencies as a function of masked facial affects in patients with BPD compared to healthy individuals. As BPD comorbidity rates for mental and personality disorders are high, we investigated also the relationships of affective processing characteristics with specific borderline symptoms and comorbidity. Twenty-nine women with BPD and 38 healthy women participated in the study. The majority of patients suffered from additional Axis I disorders and/or additional personality disorders. In the priming experiment, angry, happy, neutral, or no facial expression was briefly presented (for 33 ms) and masked by neutral faces that had to be evaluated. Evaluative decisions and response latencies were registered. Borderline-typical symptomatology was assessed with the Borderline Symptom List. In the total sample, valence-congruent evaluative shifts and delays of evaluative decision due to facial affect were observed. No between-group differences were obtained for evaluative decisions and latencies. The presence of comorbid anxiety disorders was found to be positively correlated with evaluative shifting owing to masked happy primes, regardless of baseline-neutral or no facial expression condition. The presence of comorbid depressive disorder, paranoid personality disorder, and symptoms of social isolation and self-aggression were significantly correlated with response delay due to masked angry faces, regardless of baseline. In the present affective priming study, no abnormalities in the automatic recognition and processing of facial affects were observed in BPD patients compared to healthy individuals. The presence of comorbid anxiety disorders could make patients more susceptible to the influence of a happy expression on judgment processes at an automatic processing level. Comorbid depressive disorder, paranoid personality disorder, and symptoms of social isolation and self-aggression may enhance automatic attention allocation to threatening facial expressions in BPD. Increased automatic vigilance for social threat stimuli might contribute to affective instability and interpersonal problems in specific patients with BPD.
Vijayakumar, A; Rosen, Joseph
2017-06-12
Recording digital holograms without wave interference simplifies the optical systems, increases their power efficiency and avoids complicated aligning procedures. We propose and demonstrate a new technique of digital hologram acquisition without two-wave interference. Incoherent light emitted from an object propagates through a random-like coded phase mask and recorded directly without interference by a digital camera. In the training stage of the system, a point spread hologram (PSH) is first recorded by modulating the light diffracted from a point object by the coded phase masks. At least two different masks should be used to record two different intensity distributions at all possible axial locations. The various recorded patterns at every axial location are superposed in the computer to obtain a complex valued PSH library cataloged to its axial location. Following the training stage, an object is placed within the axial boundaries of the PSH library and the light diffracted from the object is once again modulated by the same phase masks. The intensity patterns are recorded and superposed exactly as the PSH to yield a complex hologram of the object. The object information at any particular plane is reconstructed by a cross-correlation between the complex valued hologram and the appropriate element of the PSH library. The characteristics and the performance of the proposed system were compared with an equivalent regular imaging system.
1989-10-06
spent pumice cleaning. All parts can be pumice cleaned faster by using the method described in Quick Fix Plan paragraph 6.0. Soaking the scrubbed masked...times were run at an unusuall fast pace. For two other days workers were observed masking parts and by excluding the time spent talking and working on...stop-off Lacquer, MICCROSTOP REDUCER is recom. mended. Also, a shot soak in caustic cleaner, both at 212’ F., will break the adhesion and the coating is
Masked priming effect reflects evidence accumulated by the prime.
Kinoshita, Sachiko; Norris, Dennis
2010-01-01
In the same-different match task, masked priming is observed with the same responses but not different responses. Norris and Kinoshita's (2008) Bayesian reader account of masked priming explains this pattern based on the same principle as that explaining the absence of priming for nonwords in the lexical decision task. The pattern of priming follows from the way the model makes optimal decisions in the two tasks; priming does not depend on first activating the prime and then the target. An alternative explanation is in terms of a bias towards responding "same" that exactly counters the facilitatory effect of lexical access. The present study tested these two views by varying both the degree to which the prime predicts the response and the visibility of the prime. Unmasked primes produced effects expected from the view that priming is influenced by the degree to which the prime predicts the response. In contrast, with masked primes, the size of priming for the same response was completely unaffected by predictability. These results rule out response bias as an explanation of the absence of masked priming for different responses and, in turn, indicate that masked priming is not a consequence of automatic lexical access of the prime.
Performance of an Achromatic Focal Plane Mask for Exoplanet Imaging Coronagraphy
NASA Technical Reports Server (NTRS)
Newman, Kevin; Belikov, Ruslan; Pluzhnik, Eugene; Balasubramanian, Kunjithapatham; Wilson, Dan
2014-01-01
Coronagraph technology combined with wavefront control is close to achieving the contrast and inner working angle requirements in the lab necessary to observe the faint signal of an Earth-like exoplanet in monochromatic light. An important remaining technological challenge is to achieve high contrast in broadband light. Coronagraph bandwidth is largely limited by chromaticity of the focal plane mask, which is responsible for blocking the stellar PSF. The size of a stellar PSF scales linearly with wavelength; ideally, the size of the focal plane mask would also scale with wavelength. A conventional hard-edge focal plane mask has a fixed size, normally sized for the longest wavelength in the observational band to avoid starlight leakage. The conventional mask is oversized for shorter wavelengths and blocks useful discovery space. Recently we presented a solution to the size chromaticity challenge with a focal plane mask designed to scale its effective size with wavelength. In this paper, we analyze performance of the achromatic size-scaling focal plane mask within a Phase Induced Amplitude Apodization (PIAA) coronagraph. We present results from wavefront control around the achromatic focal plane mask, and demonstrate the size-scaling effect of the mask with wavelength. The edge of the dark zone, and therefore the inner working angle of the coronagraph, scale with wavelength. The achromatic mask enables operation in a wider band of wavelengths compared with a conventional hard-edge occulter.
Coronagraphic mask design using Hermite functions.
Cagigal, Manuel P; Canales, Vidal F; Valle, Pedro J; Oti, José E
2009-10-26
We introduce a stellar coronagraph that uses a coronagraphic mask described by a Hermite function or a combination of them. It allows the detection of exoplanets providing both deep starlight extinction and high angular resolution. This angular resolution depends on the order of the Hermite function used. An analysis of the coronagraph performance is carried out for different even order masks. Numerical simulations of the ideal case, with no phase errors and perfect telescope pointing, show that on-axis starlight is reduced to very low intensity levels corresponding to a gain of at least 25 magnitudes (10(-10) light intensity reduction). The coronagraphic throughput depends on the Hermite function or combination selected. The proposed mask series presents the same advantages of band limited masks along with the benefit of reducing the light diffracted by the mask border thanks to its particular shape. Nevertheless, for direct detection of Earth-like exoplanets it requires the use of adaptive optics facilities for compensating the perturbations introduced by the atmosphere and by the optical system.
Fluoride contamination sensor based on optical fiber grating technology
NASA Astrophysics Data System (ADS)
Jadhav, Mangesh S.; Laxmeshwar, Lata S.; Akki, Jyoti F.; Raikar, P. U.; Kumar, Jitendra; Prakash, Om; Raikar, U. S.
2017-11-01
A number of distinct advantages of the optical fiber technology in the field of sensors and communications which leads to enormous applications. Fiber Bragg grating (FBG) developed from the fabrication of photosensitive fiber through phase mask technique is used in the present report. The designed fiber sensor used for the detection and determination of contaminants in drinking water at ppm & ppb level and it is considered as a special type of concentration sensor. The test samples of drinking water have been collected from different regions. In this paper we have calibrated the FBG sensor to detect Flouride concentration in drinking water in the range of 0.05-8 ppm. According to WHO, the normal range of fluoride content in drinking water is about 0.7 ppm to 1.5 ppm. The results for resultant spectral shifts for test samples are closely agree with standard values.
Nonpharmaceutical Interventions for Pandemic Influenza, National and Community Measures
2006-01-01
The World Health Organization's recommended pandemic influenza interventions, based on limited data, vary by transmission pattern, pandemic phase, and illness severity and extent. In the pandemic alert period, recommendations include isolation of patients and quarantine of contacts, accompanied by antiviral therapy. During the pandemic period, the focus shifts to delaying spread and reducing effects through population-based measures. Ill persons should remain home when they first become symptomatic, but forced isolation and quarantine are ineffective and impractical. If the pandemic is severe, social distancing measures such as school closures should be considered. Nonessential domestic travel to affected areas should be deferred. Hand and respiratory hygiene should be routine; mask use should be based on setting and risk, and contaminated household surfaces should be disinfected. Additional research and field assessments during pandemics are essential to update recommendations. Legal authority and procedures for implementing interventions should be understood in advance and should respect cultural differences and human rights. PMID:16494723
Combinatorial studies of (1-x)Na0.5Bi0.5TiO3-xBaTiO3 thin-film chips
NASA Astrophysics Data System (ADS)
Cheng, Hong-Wei; Zhang, Xue-Jin; Zhang, Shan-Tao; Feng, Yan; Chen, Yan-Feng; Liu, Zhi-Guo; Cheng, Guang-Xi
2004-09-01
Applying a combinatorial methodology, (1-x)Na0.5Bi0.5TiO3-xBaTiO3 (NBT-BT) thin-film chips were fabricated on (001)-LaAlO3 substrates by pulsed laser deposition with a few quaternary masks. A series of NBT-BT library with the composition of BT ranged from 0 to 44% was obtained with uniform composition and well crystallinity. The relation between the concentration of NBT-BT and their structural and dielectric properties were investigated by x-ray diffraction (XRD), evanescent microwave probe, atomic force microscopy, and Raman spectroscopy. An obvious morphotropic phase boundary (MPB) was established to be about 9% BT by XRD, Raman frequency shift, and dielectric anomaly, different from the well-known MPB of the materials. The result shows the high efficiency of combinatorial method in searching new relaxor ferroelectrics.
Pospori, A; Marques, C A F; Sagias, G; Lamela-Rivera, H; Webb, D J
2018-01-22
The Bragg wavelength of a polymer optical fiber Bragg grating can be permanently shifted by utilizing the thermal annealing method. In all the reported fiber annealing cases, the authors were able to tune the Bragg wavelength only to shorter wavelengths, since the polymer fiber shrinks in length during the annealing process. This article demonstrates a novel thermal annealing methodology for permanently tuning polymer optical fiber Bragg gratings to any desirable spectral position, including longer wavelengths. Stretching the polymer optical fiber during the annealing process, the period of Bragg grating, which is directly related with the Bragg wavelength, can become permanently longer. The methodology presented in this article can be used to multiplex polymer optical fiber Bragg gratings at any desirable spectral position utilizing only one phase-mask for their photo-inscription, reducing thus their fabrication cost in an industrial setting.
Spatial Attention Enhances Perceptual Processing of Single-Element Displays
NASA Technical Reports Server (NTRS)
Bacon, William; Johnston, James C.; Remington, Roger W.; Null, Cynthia H. (Technical Monitor)
1994-01-01
Shiu and Pashler (1993) reported that precueing masked, single-element displays had negligible effects on identification accuracy. They argued that spatial attention does not actually enhance stimulus perceptibility, but only reduces decision noise. Alternatively, such negative results may arise if cues are sub-optimal, or if masks place an insufficient premium on timely deployment of attention. We report results showing that valid cueing enhances processing of even single-element displays. Spatial attention does indeed enhance perceptual processes.
Cortical dynamics of figure-ground segmentation: shine-through.
Francis, Gregory
2009-01-01
The shine-through effect occurs when a brief offset vernier target is followed by a grating of non-offset vernier elements. Rather than mask the target, this stimulus sequence produces a percept of the target vernier occluding the mask elements. We analyzed the dynamics of the 3D LAMINART model of depth perception and found that it explains the appearance of shine-through for these stimuli. The model explanation proposes that shine-through is due to a combination of false binocular disparity matches between the target and the central element of the mask, and a weakening of between disparity competition due to spatial competition and boundary grouping. Simulations of the model demonstrate that its behavior closely matches empirical data on the properties of shine-through. The model is contrasted with an alternative explanation of shine-through, and novel mask conditions are studied that allow for empirical tests of the model hypotheses.
Thiolation mediated pegylation platform to generate functional universal red blood cells.
Nacharaju, Parimala; Manjula, Belur N; Acharya, Seetharama A
2007-01-01
The PEGylation that adds an extension arm on protein amino groups with the conservation of their positive charge masks the A and D antigens of erythrocytes efficiently. In the present study, the efficiency of masking the antigens of RBC by PEGylation protocols that do not conserve the charge with and without adding extension arms is compared. The conjugation of PEG-5000 to RBCs through the addition of extension arms masked the D antigen more efficiently than the other protocol. A combination of PEG-5 K and PEG-20 K is needed to mask the A antigen, irrespective of the PEGylation approach. The oxygen affinity of the PEGylated RBCs increased by the extension arm facilitated PEGylation. The protocol involving the conjugation of PEG-chains without adding extension arm did not alter the oxygen affinity of RBCs. A combination of PEGylation protocols is an alternate strategy to generate universal red blood cells with good levels of oxygen affinity.
Vitreous carbon mask substrate for X-ray lithography
Aigeldinger, Georg [Livermore, CA; Skala, Dawn M [Fremont, CA; Griffiths, Stewart K [Livermore, CA; Talin, Albert Alec [Livermore, CA; Losey, Matthew W [Livermore, CA; Yang, Chu-Yeu Peter [Dublin, CA
2009-10-27
The present invention is directed to the use of vitreous carbon as a substrate material for providing masks for X-ray lithography. The new substrate also enables a small thickness of the mask absorber used to pattern the resist, and this enables improved mask accuracy. An alternative embodiment comprised the use of vitreous carbon as a LIGA substrate wherein the VC wafer blank is etched in a reactive ion plasma after which an X-ray resist is bonded. This surface treatment provides a surface enabling good adhesion of the X-ray photoresist and subsequent nucleation and adhesion of the electrodeposited metal for LIGA mold-making while the VC substrate practically eliminates secondary radiation effects that lead to delamination of the X-ray resist form the substrate, the loss of isolated resist features, and the formation of a resist layer adjacent to the substrate that is insoluble in the developer.
NASA Astrophysics Data System (ADS)
Ma, Xu; Li, Yanqiu; Guo, Xuejia; Dong, Lisong
2012-03-01
Optical proximity correction (OPC) and phase shifting mask (PSM) are the most widely used resolution enhancement techniques (RET) in the semiconductor industry. Recently, a set of OPC and PSM optimization algorithms have been developed to solve for the inverse lithography problem, which are only designed for the nominal imaging parameters without giving sufficient attention to the process variations due to the aberrations, defocus and dose variation. However, the effects of process variations existing in the practical optical lithography systems become more pronounced as the critical dimension (CD) continuously shrinks. On the other hand, the lithography systems with larger NA (NA>0.6) are now extensively used, rendering the scalar imaging models inadequate to describe the vector nature of the electromagnetic field in the current optical lithography systems. In order to tackle the above problems, this paper focuses on developing robust gradient-based OPC and PSM optimization algorithms to the process variations under a vector imaging model. To achieve this goal, an integrative and analytic vector imaging model is applied to formulate the optimization problem, where the effects of process variations are explicitly incorporated in the optimization framework. The steepest descent algorithm is used to optimize the mask iteratively. In order to improve the efficiency of the proposed algorithms, a set of algorithm acceleration techniques (AAT) are exploited during the optimization procedure.
Research on effects of phase error in phase-shifting interferometer
NASA Astrophysics Data System (ADS)
Wang, Hongjun; Wang, Zhao; Zhao, Hong; Tian, Ailing; Liu, Bingcai
2007-12-01
Referring to phase-shifting interferometry technology, the phase shifting error from the phase shifter is the main factor that directly affects the measurement accuracy of the phase shifting interferometer. In this paper, the resources and sorts of phase shifting error were introduction, and some methods to eliminate errors were mentioned. Based on the theory of phase shifting interferometry, the effects of phase shifting error were analyzed in detail. The Liquid Crystal Display (LCD) as a new shifter has advantage as that the phase shifting can be controlled digitally without any mechanical moving and rotating element. By changing coded image displayed on LCD, the phase shifting in measuring system was induced. LCD's phase modulation characteristic was analyzed in theory and tested. Based on Fourier transform, the effect model of phase error coming from LCD was established in four-step phase shifting interferometry. And the error range was obtained. In order to reduce error, a new error compensation algorithm was put forward. With this method, the error can be obtained by process interferogram. The interferogram can be compensated, and the measurement results can be obtained by four-step phase shifting interferogram. Theoretical analysis and simulation results demonstrate the feasibility of this approach to improve measurement accuracy.
Implementation of assist features in EUV lithography
NASA Astrophysics Data System (ADS)
Jiang, Fan; Burkhardt, Martin; Raghunathan, Ananthan; Torres, Andres; Gupta, Rachit; Word, James
2015-03-01
The introduction of EUV lithography will happen at a critical feature pitch which corresponds to a k1 factor of roughly 0.45. While this number seems not very aggressive compared to recent ArF lithography nodes, the number is sufficiently low that the introduction of assist features has to be considered. While the small NA makes the k1 factor larger, the depth of focus still needs to be scaled down with wavelength. However the exposure tool's focus control is not greatly improved over the ArF tools, so other solutions to improve the depth of focus, e.g. SRAFs, are needed. On the other hand, sub-resolution assist features (SRAFs) require very small mask dimensions, which make masks more costly to write and inspect. Another disadvantage of SRAFs is the fact that they may cause pattern-dependent best focus shift due to thick mask effects. Those effects can be predicted, but the shift of best focus and the associated tilt of Bossung curves make the process more difficult to control. We investigate the impact of SRAFs on printing in EUV lithography and evaluate advantages and disadvantages. By using image quality parameters such as best focus (BF), and depth of focus (DOF), respectively with and without SRAFs, we will answer the question if we can gain a net benefit for 1D and 2D patterns by adding SRAFs. SRAFs will only be introduced if any net improvement in process variation (PV) outweighs the additional expense of assist patterning on the mask. In this paper, we investigate the difference in printing behavior of symmetric and asymmetric SRAF placement and whether through slit effect needs to be considered in SRAF placement for EUV lithography.
Underwater Detonations at the Silver Strand Training Complex: Effects on Marine Mammals
2009-04-30
and S. H. Ridgway (2000), "Auditory and Behavioral Responses of Bottlenose Dolphins (Tursiops truncatus) and a Beluga Whale ( Delphinapterus leucas ...Shift in Masked Hearing Thresholds of Bottlenose Dolphins, Tursiops truncatus, and White Whales, Delphinapterus leucas , after Exposure to Intense Tones
Kuwan; Tsukamoto; Taki; Horibuchi; Oki; Kawaguchi; Shibata; Sawaki; Hiramatsu
2000-01-01
Cross-sectional transmission electron microscope (TEM) observation was performed for selectively grown gallium nitride (GaN) in order to examine the dependence of GaN microstructure on the growth conditions. The GaN films were grown by hydride vapour phase epitaxy (HVPE) or metalorganic vapour phase epitaxy (MOVPE) on GaN covered with a patterned mask. Thin foil specimens for TEM observation were prepared with focused ion beam (FIB) machining apparatus. It was demonstrated that the c-axis of GaN grown over the terrace of the mask tilts towards the centre of the terrace when the GaN is grown in a carrier gas of N2. The wider terrace results in a larger tilting angle if other growth conditions are identical. The tilting is attributed to 'horizontal dislocations' (HDs) generated during the overgrowth of GaN on the mask terrace. The HDs in HVPE-GaN have a semi-loop shape and are tangled with one another, while those in MOVPE-GaN are straight and lined up to form low-angle grain boundaries.
Dual-domain lateral shearing interferometer
Naulleau, Patrick P.; Goldberg, Kenneth Alan
2004-03-16
The phase-shifting point diffraction interferometer (PS/PDI) was developed to address the problem of at-wavelength metrology of extreme ultraviolet (EUV) optical systems. Although extremely accurate, the fact that the PS/PDI is limited to use with coherent EUV sources, such as undulator radiation, is a drawback for its widespread use. An alternative to the PS/PDI, with relaxed coherence requirements, is lateral shearing interferometry (LSI). The use of a cross-grating, carrier-frequency configuration to characterize a large-field 4.times.-reduction EUV lithography optic is demonstrated. The results obtained are directly compared with PS/PDI measurements. A defocused implementation of the lateral shearing interferometer in which an image-plane filter allows both phase-shifting and Fourier wavefront recovery. The two wavefront recovery methods can be combined in a dual-domain technique providing suppression of noise added by self-interference of high-frequency components in the test-optic wavefront.
Lee, Shao-Hsuan; Hsiao, Tzu-Yu; Lee, Guo-She
2015-06-01
Sustained vocalizations of vowels [a], [i], and syllable [mə] were collected in twenty normal-hearing individuals. On vocalizations, five conditions of different audio-vocal feedback were introduced separately to the speakers including no masking, wearing supra-aural headphones only, speech-noise masking, high-pass noise masking, and broad-band-noise masking. Power spectral analysis of vocal fundamental frequency (F0) was used to evaluate the modulations of F0 and linear-predictive-coding was used to acquire first two formants. The results showed that while the formant frequencies were not significantly shifted, low-frequency modulations (<3 Hz) of F0 significantly increased with reduced audio-vocal feedback across speech sounds and were significantly correlated with auditory awareness of speakers' own voices. For sustained speech production, the motor speech controls on F0 may depend on a feedback mechanism while articulation should rely more on a feedforward mechanism. Power spectral analysis of F0 might be applied to evaluate audio-vocal control for various hearing and neurological disorders in the future. Copyright © 2015 Elsevier B.V. All rights reserved.
Phase shifts, herbivory, and the resilience of coral reefs to climate change.
Hughes, Terence P; Rodrigues, Maria J; Bellwood, David R; Ceccarelli, Daniela; Hoegh-Guldberg, Ove; McCook, Laurence; Moltschaniwskyj, Natalie; Pratchett, Morgan S; Steneck, Robert S; Willis, Bette
2007-02-20
Many coral reefs worldwide have undergone phase shifts to alternate, degraded assemblages because of the combined effects of over-fishing, declining water quality, and the direct and indirect impacts of climate change. Here, we experimentally manipulated the density of large herbivorous fishes to test their influence on the resilience of coral assemblages in the aftermath of regional-scale bleaching in 1998, the largest coral mortality event recorded to date. The experiment was undertaken on the Great Barrier Reef, within a no-fishing reserve where coral abundances and diversity had been sharply reduced by bleaching. In control areas, where fishes were abundant, algal abundance remained low, whereas coral cover almost doubled (to 20%) over a 3 year period, primarily because of recruitment of species that had been locally extirpated by bleaching. In contrast, exclusion of large herbivorous fishes caused a dramatic explosion of macroalgae, which suppressed the fecundity, recruitment, and survival of corals. Consequently, management of fish stocks is a key component in preventing phase shifts and managing reef resilience. Importantly, local stewardship of fishing effort is a tractable goal for conservation of reefs, and this local action can also provide some insurance against larger-scale disturbances such as mass bleaching, which are impractical to manage directly.
Carlyon, Robert P; Deeks, John M; Undurraga, Jaime; Macherey, Olivier; van Wieringen, Astrid
2017-10-01
Three experiments studied the extent to which cochlear implant users' spatial selectivity can be manipulated using asymmetric waveforms and tested an efficient method for comparing spatial selectivity produced by different stimuli. Experiment 1 measured forward-masked psychophysical tuning curves (PTCs) for a partial tripolar (pTP) probe. Maskers were presented on bipolar pairs separated by one unused electrode; waveforms were either symmetric biphasic ("SYM") or pseudomonophasic with the short high-amplitude phase being either anodic ("PSA") or cathodic ("PSC") on the more apical electrode. For the SYM masker, several subjects showed PTCs consistent with a bimodal excitation pattern, with discrete excitation peaks on each electrode of the bipolar masker pair. Most subjects showed significant differences between the PSA and PSC maskers consistent with greater masking by the electrode where the high-amplitude phase was anodic, but the pattern differed markedly across subjects. Experiment 2 measured masked excitation patterns for a pTP probe and either a monopolar symmetric biphasic masker ("MP_SYM") or pTP pseudomonophasic maskers where the short high-amplitude phase was either anodic ("TP_PSA") or cathodic ("TP_PSC") on the masker's central electrode. Four of the five subjects showed significant differences between the masker types, but again the pattern varied markedly across subjects. Because the levels of the maskers were chosen to produce the same masking of a probe on the same channel as the masker, it was correctly predicted that maskers that produce broader masking patterns would sound louder. Experiment 3 exploited this finding by using a single-point measure of spread of excitation to reveal significantly better spatial selectivity for TP_PSA compared to TP_PSC maskers.
Digital holographic microscopy for detection of Trypanosoma cruzi parasites in fresh blood mounts
NASA Astrophysics Data System (ADS)
Romero, G. G.; Monaldi, A. C.; Alanís, E. E.
2012-03-01
An off-axis holographic microscope, in a transmission mode, calibrated to automatically detect the presence of Trypanosoma cruzi in blood is developed as an alternative diagnosis tool for Chagas disease. Movements of the microorganisms are detected by measuring the phase shift they produce on the transmitted wave front. A thin layer of blood infected by Trypanosoma cruzi parasites is examined in the holographic microscope, the images of the visual field being registered with a CCD camera. Two consecutive holograms of the same visual field are subtracted point by point and a phase contrast image of the resulting hologram is reconstructed by means of the angular spectrum propagation algorithm. This method enables the measurement of phase distributions corresponding to temporal differences between digital holograms in order to detect whether parasites are present or not. Experimental results obtained using this technique show that it is an efficient alternative that can be incorporated successfully as a part of a fully automatic system for detection and counting of this type of microorganisms.
Solid lipid microparticles containing loratadine prepared using a Micromixer.
Milak, Spomenka; Medlicott, Natalie; Tucker, Ian G
2006-12-01
Solid lipid microparticles were investigated as a taste-masking approach for a lipophilic weak base in a suspension. The idea was that the drug concentration in the aqueous phase of a suspension might be reduced by its partitioning into the solid lipid particles. Loratadine, as a model drug, was used to prepare Precirol ATO 5 microparticles by a Micromixer. The effects of three process variables: drug loading, PVA concentration and water/lipid ratio on the microparticle size, encapsulation efficiency, surface appearance, in-vitro release and drug partitioning in a suspension were studied. Loratadine release was slow in simulated saliva and very fast at the pH of stomach. In suspension of loratadine lipid microparticles, drug was released into the aqueous phase to the same concentration as in a drug suspension. Therefore, the usefulness of these microparticles for taste-masking in liquids is limited. However, they might be useful for taste-masking in solid dosage forms.
Digital chaos-masked optical encryption scheme enhanced by two-dimensional key space
NASA Astrophysics Data System (ADS)
Liu, Ling; Xiao, Shilin; Zhang, Lu; Bi, Meihua; Zhang, Yunhao; Fang, Jiafei; Hu, Weisheng
2017-09-01
A digital chaos-masked optical encryption scheme is proposed and demonstrated. The transmitted signal is completely masked by interference chaotic noise in both bandwidth and amplitude with analog method via dual-drive Mach-Zehnder modulator (DDMZM), making the encrypted signal analog, noise-like and unrecoverable by post-processing techniques. The decryption process requires precise matches of both the amplitude and phase between the cancellation and interference chaotic noises, which provide a large two-dimensional key space with the help of optical interference cancellation technology. For 10-Gb/s 16-quadrature amplitude modulation (QAM) orthogonal frequency division multiplexing (OFDM) signal over the maximum transmission distance of 80 km without dispersion compensation or inline amplifier, the tolerable mismatch ranges of amplitude and phase/delay at the forward error correction (FEC) threshold of 3.8×10-3 are 0.44 dB and 0.08 ns respectively.
The Relationship between MOC Reflex and Masked Threshold
Garinis, Angela; Werner, Lynne; Abdala, Carolina
2011-01-01
Otoacoustic emission (OAE) amplitude can be reduced by acoustic stimulation. This effect is produced by the medial olivocochlear (MOC) reflex. Past studies have shown that the MOC reflex is related to listening in noise and attention. In the present study, the relationship between strength of the contralateral MOC reflex and masked threshold was investigated in 19 adults. Detection thresholds were determined for a 1000-Hz, 300-ms tone presented simultaneously with one repetition of a 300-ms masker in an ongoing train of 300-ms masker bursts at 600-ms intervals. Three masking conditions were tested: 1) broadband noise 2) a fixed-frequency 4-tone complex masker and 3) a random-frequency 4-tone complex masker. Broadband noise was expected to produce energetic masking and the tonal maskers were expected to produce informational masking in some listeners. DPOAEs were recorded at fine frequency interval from 500 to 4000 Hz, with and without contralateral acoustic stimulation. MOC reflex strength was estimated as a reduction in baseline level and a shift in frequency of DPOAE fine-structure maxima near 1000-Hz. MOC reflex and psychophysical testing were completed in separate sessions. Individuals with poorer thresholds in broadband noise and in random-frequency maskers were found to have stronger MOC reflexes. PMID:21878379
Compressed sensing with cyclic-S Hadamard matrix for terahertz imaging applications
NASA Astrophysics Data System (ADS)
Ermeydan, Esra Şengün; ćankaya, Ilyas
2018-01-01
Compressed Sensing (CS) with Cyclic-S Hadamard matrix is proposed for single pixel imaging applications in this study. In single pixel imaging scheme, N = r . c samples should be taken for r×c pixel image where . denotes multiplication. CS is a popular technique claiming that the sparse signals can be reconstructed with samples under Nyquist rate. Therefore to solve the slow data acquisition problem in Terahertz (THz) single pixel imaging, CS is a good candidate. However, changing mask for each measurement is a challenging problem since there is no commercial Spatial Light Modulators (SLM) for THz band yet, therefore circular masks are suggested so that for each measurement one or two column shifting will be enough to change the mask. The CS masks are designed using cyclic-S matrices based on Hadamard transform for 9 × 7 and 15 × 17 pixel images within the framework of this study. The %50 compressed images are reconstructed using total variation based TVAL3 algorithm. Matlab simulations demonstrates that cyclic-S matrices can be used for single pixel imaging based on CS. The circular masks have the advantage to reduce the mechanical SLMs to a single sliding strip, whereas the CS helps to reduce acquisition time and energy since it allows to reconstruct the image from fewer samples.
NASA Astrophysics Data System (ADS)
Xing, Kezhao; Björnborg, Charles; Karlsson, Henrik; Paulsson, Adisa; Rosendahl, Anna; Beiming, Peter; Vedenpää, Jukka; Walford, Jonathan; Newman, Tom
2007-10-01
Tighter requirements on mask resolution, CD and image positioning accuracy at and beyond the 45 nm technology node push the development of improved photomask blanks. One such blank for attenuated phase-shift masks (att-PSM) provides a thinner chrome film, named TF11, with higher chrome etch rate compared to the previous generation Att- PSM blank (NTAR5 chrome film) from the same supplier. Reduced stress in the chrome film also results in less image placement error induced by the material. FEP-171 is the positive chemically amplified resist (PCAR) that is most commonly used in advanced mask manufacturing with both 50 keV variable shaped e-beam (VSB) and DUV laser pattern generators. TF11 allows an FEP-171 resist film down to about 2000 Å thickness with sufficient etch resistance, while the standard resist thickness for NTAR5 is around 3000 Å. This work has experimentally evaluated the use of TF11 chrome and FEP-171 resist together with a 248 nm DUV laser pattern generator, the Sigma7500. First, patterning performance in resist with thicknesses from 2000 Å to 2600 Å, in steps of 100 Å, was tested with respect to swing curve and basic lithographic parameters including resolution, CD linearity, CD iso-dense bias and dose sensitivity. Patterning results on mask showed a swing minimum at around 2200 Å and a swing maximum at around 2500 Å, which correspond to reflectivity measurements for 248 nm wavelength performed by the blank supplier. It was concluded that the overall patterning performance was best close to the swing maximum. Thereafter the patterning performance using TF11 at two resist thicknesses, 2000 Å and 2550 Å, was studied in more detail and compared to performance using NTAR5 with 3200 Å resist. The evaluation showed that the Sigma7500-II offers good compatibility with TF11, especially using the optimized FEP-171 resist thickness of 2550 Å. It also showed that the patterning capability of the Sigma7500-II using TF11 and 2550 Å resist is improved compared to using NTAR5 and 3200 Å resist.
Holanda, Marcelo Alcantara; Reis, Ricardo Coelho; Winkeler, Georgia Freire Paiva; Fortaleza, Simone Castelo Branco; Lima, José Wellington de Oliveira; Pereira, Eanes Delgado Barros
2009-02-01
Failure of noninvasive ventilation (NIV) has been associated with short-term adverse effects related to the use of masks. The aim of this study was to compare the incidence, type and intensity of adverse effects, as well as the comfort, of total face masks (TFMs), facial masks (FMs) and nasal masks (NMs) during NIV. This was a randomized crossover trial involving 24 healthy volunteers submitted to six sessions of NIV in bilevel positive airway pressure mode using the TFM, FM and NM masks at low and moderate-to-high pressure levels. A written questionnaire was applied in order to evaluate eleven specific adverse effects related to the use of the masks. Comfort was assessed using a visual analog scale. The CO2 exhaled into the ventilator circuit was measured between the mask and the exhalation port. The performance of the TFM was similar to that of the NM and FM in terms of comfort scores. Higher pressure levels reduced comfort and increased adverse effects, regardless of the mask type. When the TFM was used, there were fewer air leaks and less pain at the nose bridge, although there was greater oronasal dryness and claustrophobia. Air leaks were most pronounced when the FM was used. The partial pressure of exhaled CO2 entering the ventilator circuit was zero for the TFM. The short-term adverse effects caused by NIV interfaces are related to mask type and pressure settings. The TFM is a reliable alternative to the NM and FM. Rebreathing of CO2 from the circuit is less likely to occur when a TFM is used.
Bubble masks for time-encoded imaging of fast neutrons.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Brubaker, Erik; Brennan, James S.; Marleau, Peter
2013-09-01
Time-encoded imaging is an approach to directional radiation detection that is being developed at SNL with a focus on fast neutron directional detection. In this technique, a time modulation of a detected neutron signal is inducedtypically, a moving mask that attenuates neutrons with a time structure that depends on the source position. An important challenge in time-encoded imaging is to develop high-resolution two-dimensional imaging capabilities; building a mechanically moving high-resolution mask presents challenges both theoretical and technical. We have investigated an alternative to mechanical masks that replaces the solid mask with a liquid such as mineral oil. Instead of fixedmore » blocks of solid material that move in pre-defined patterns, the oil is contained in tubing structures, and carefully introduced air gapsbubblespropagate through the tubing, generating moving patterns of oil mask elements and air apertures. Compared to current moving-mask techniques, the bubble mask is simple, since mechanical motion is replaced by gravity-driven bubble propagation; it is flexible, since arbitrary bubble patterns can be generated by a software-controlled valve actuator; and it is potentially high performance, since the tubing and bubble size can be tuned for high-resolution imaging requirements. We have built and tested various single-tube mask elements, and will present results on bubble introduction and propagation as a function of tubing size and cross-sectional shape; real-time bubble position tracking; neutron source imaging tests; and reconstruction techniques demonstrated on simple test data as well as a simulated full detector system.« less
Method and apparatus for inspecting reflection masks for defects
Bokor, Jeffrey; Lin, Yun
2003-04-29
An at-wavelength system for extreme ultraviolet lithography mask blank defect detection is provided. When a focused beam of wavelength 13 nm is incident on a defective region of a mask blank, three possible phenomena can occur. The defect will induce an intensity reduction in the specularly reflected beam, scatter incoming photons into an off-specular direction, and change the amplitude and phase of the electric field at the surface which can be monitored through the change in the photoemission current. The magnitude of these changes will depend on the incident beam size, and the nature, extent and size of the defect. Inspection of the mask blank is performed by scanning the mask blank with 13 nm light focused to a spot a few .mu.m in diameter, while measuring the reflected beam intensity (bright field detection), the scattered beam intensity (dark-field detection) and/or the change in the photoemission current.
NASA Astrophysics Data System (ADS)
Singh, Hukum
2016-06-01
An asymmetric scheme has been proposed for optical double images encryption in the gyrator wavelet transform (GWT) domain. Grayscale and binary images are encrypted separately using double random phase encoding (DRPE) in the GWT domain. Phase masks based on devil's vortex Fresnel Lens (DVFLs) and random phase masks (RPMs) are jointly used in spatial as well as in the Fourier plane. The images to be encrypted are first gyrator transformed and then single-level discrete wavelet transformed (DWT) to decompose LL , HL , LH and HH matrices of approximation, horizontal, vertical and diagonal coefficients. The resulting coefficients from the DWT are multiplied by other RPMs and the results are applied to inverse discrete wavelet transform (IDWT) for obtaining the encrypted images. The images are recovered from their corresponding encrypted images by using the correct parameters of the GWT, DVFL and its digital implementation has been performed using MATLAB 7.6.0 (R2008a). The mother wavelet family, DVFL and gyrator transform orders associated with the GWT are extra keys that cause difficulty to an attacker. Thus, the scheme is more secure as compared to conventional techniques. The efficacy of the proposed scheme is verified by computing mean-squared-error (MSE) between recovered and the original images. The sensitivity of the proposed scheme is verified with encryption parameters and noise attacks.
The Effect of a Diving Mask on Intraocular Pressure in a Healthy Population.
Goenadi, Catherina Josephine; Law, David Zhiwei; Lee, Jia Wen; Ong, Ee Lin; Chee, Wai Kitt; Cheng, Jason
2016-01-01
Swimming goggles increase the intraocular pressure (IOP) via the periorbital frame pressure and suction effect. In comparison, diving masks have a larger frame rim and incorporate the nose. The exact effect(s) of diving masks on IOP is unknown. This study evaluates the influence of diving masks on IOP in normal, healthy subjects. Tonometry was performed in both eyes of all subjects with an AVIA(®)Tono-Pen by a single investigator. Measurements were taken at baseline without the diving mask and with the subjects wearing a small-volume, double-window diving mask, but with the mask lenses removed. Two IOP readings in each eye were measured, and an additional reading was measured if the difference between the initial 2 was ≥2 mm Hg. Central corneal thickness (CCT) was also measured in each eye, using a contact pachymeter (OcuScan(®)Alcon). Forty eyes of 20 healthy volunteers (age 29.7 ± 9.3 years; range 21-52) were included. The mean CCT was 544.4 ± 43.5 µm. The mean IOP before the diving mask was worn had been 17.23 ± 2.18 mm Hg (n = 40). The IOP decreased by 0.43 mm Hg (p $1003c; 0.05) to 16.80 ± 2.57 mm Hg after the diving mask had been put on. There was no correlation between IOP change and age (r = 0.143, p = 0.337), gender (r = -0.174, p = 0.283) or CCT (r = -0.123, p = 0.445). There was no increase in IOP after the diving mask had been worn. A small but statistically significant decrease in IOP was observed. This study demonstrates that unlike swimming goggles, the strap tension and frame pressure on the periorbital tissue from a diving mask does not increase IOP. Diving masks may be a suitable alternative to swimming goggles for patients with advanced glaucoma or glaucoma filtration surgery.
The Effect of a Diving Mask on Intraocular Pressure in a Healthy Population
Goenadi, Catherina Josephine; Law, David Zhiwei; Lee, Jia Wen; Ong, Ee Lin; Chee, Wai Kitt; Cheng, Jason
2016-01-01
Purpose Swimming goggles increase the intraocular pressure (IOP) via the periorbital frame pressure and suction effect. In comparison, diving masks have a larger frame rim and incorporate the nose. The exact effect(s) of diving masks on IOP is unknown. This study evaluates the influence of diving masks on IOP in normal, healthy subjects. Methods Tonometry was performed in both eyes of all subjects with an AVIA®Tono-Pen by a single investigator. Measurements were taken at baseline without the diving mask and with the subjects wearing a small-volume, double-window diving mask, but with the mask lenses removed. Two IOP readings in each eye were measured, and an additional reading was measured if the difference between the initial 2 was ≥2 mm Hg. Central corneal thickness (CCT) was also measured in each eye, using a contact pachymeter (OcuScan®Alcon). Results Forty eyes of 20 healthy volunteers (age 29.7 ± 9.3 years; range 21–52) were included. The mean CCT was 544.4 ± 43.5 µm. The mean IOP before the diving mask was worn had been 17.23 ± 2.18 mm Hg (n = 40). The IOP decreased by 0.43 mm Hg (p $1003c; 0.05) to 16.80 ± 2.57 mm Hg after the diving mask had been put on. There was no correlation between IOP change and age (r = 0.143, p = 0.337), gender (r = −0.174, p = 0.283) or CCT (r = −0.123, p = 0.445). Conclusion There was no increase in IOP after the diving mask had been worn. A small but statistically significant decrease in IOP was observed. This study demonstrates that unlike swimming goggles, the strap tension and frame pressure on the periorbital tissue from a diving mask does not increase IOP. Diving masks may be a suitable alternative to swimming goggles for patients with advanced glaucoma or glaucoma filtration surgery. PMID:27462262
DOE Office of Scientific and Technical Information (OSTI.GOV)
Rahman, B.M. Farid; Divan, Ralu; Rosenmann, Daniel
2015-01-01
A well designed frequency tunable phase shifter using patterned Py with different thickness has been demonstrated. Phase shifter is implemented with a slow wave coplanar wave guide (CPW)transmission line, where the signal line has alternate short narrow and wide sections. Py is patterned on the top of narrow section for high inductance density, and inter-digital capacitor is implemented in wide section for high capacitance density. Compared with phase shifter using regular CPW, the dimension of the developed phase shifter has been reduced from 14.86 mm to4.70 mm at 2 GHz. Phase shifter based on 100 nm and 200 nm thickmore » patterned Py with the same dimensions (14lm10lm) are implemented and investigated comprehensively. FMR frequency of 3.2 GHz and 3.6 GHz without any external magnetic field has been achieved for100 nm and 200 nm thick Py film, respectively. Thicker Py has increased inductance density from 1067.2 nH/m to 1193.2 nH/m while the center frequency of the phase shifter has been shifted to 1.80 GHz. Frequency tunability of the phase shifter has been also demonstrated withDC current. The phase shifter can provide 90phase shift continuously from 2 GHz to 1.80 GHz with DC current from 0 mA to 150 mA. The design concept has great potential in design arbitrary tunable RF components such as filters and couplers.« less
Prospective iterative trial of proteasome inhibitor-based desensitization.
Woodle, E S; Shields, A R; Ejaz, N S; Sadaka, B; Girnita, A; Walsh, R C; Alloway, R R; Brailey, P; Cardi, M A; Abu Jawdeh, B G; Roy-Chaudhury, P; Govil, A; Mogilishetty, G
2015-01-01
A prospective iterative trial of proteasome inhibitor (PI)-based therapy for reducing HLA antibody (Ab) levels was conducted in five phases differing in bortezomib dosing density and plasmapheresis timing. Phases included 1 or 2 bortezomib cycles (1.3 mg/m(2) × 6-8 doses), one rituximab dose and plasmapheresis. HLA Abs were measured by solid phase and flow cytometry (FCM) assays. Immunodominant Ab (iAb) was defined as highest HLA Ab level. Forty-four patients received 52 desensitization courses (7 patients enrolled in multiple phases): Phase 1 (n = 20), Phase 2 (n = 12), Phase 3 (n = 10), Phase 4 (n = 5), Phase 5 (n = 5). iAb reductions were observed in 38 of 44 (86%) patients and persisted up to 10 months. In Phase 1, a 51.5% iAb reduction was observed at 28 days with bortezomib alone. iAb reductions increased with higher bortezomib dosing densities and included class I, II, and public antigens (HLA DRβ3, HLA DRβ4 and HLA DRβ5). FCM median channel shifts decreased in 11/11 (100%) patients by a mean of 103 ± 54 mean channel shifts (log scale). Nineteen out of 44 patients (43.2%) were transplanted with low acute rejection rates (18.8%) and de novo DSA formation (12.5%). In conclusion, PI-based desensitization consistently and durably reduces HLA Ab levels providing an alternative to intravenous immune globulin-based desensitization. © Copyright 2014 The American Society of Transplantation and the American Society of Transplant Surgeons.
Demonstration of holographic smart card system using the optical memory technology
NASA Astrophysics Data System (ADS)
Kim, JungHoi; Choi, JaeKwang; An, JunWon; Kim, Nam; Lee, KwonYeon; Jeon, SeckHee
2003-05-01
In this paper, we demonstrate the holographic smart card system using digital holographic memory technique that uses reference beam encrypted by the random phase mask to prevent unauthorized users from accessing the stored digital page. The input data that include document data, a picture of face, and a fingerprint for identification is encoded digitally and then coupled with the reference beam modulated by a random phase mask. Therefore, this proposed system can execute recording in the order of MB~GB and readout all personal information from just one card without any additional database system. Also, recorded digital holograms can't be reconstructed without a phase key and can't be copied by using computers, scanners, or photography.
Analytical treatment of the deformation behavior of EUVL masks during electrostatic chucking
NASA Astrophysics Data System (ADS)
Brandstetter, Gerd; Govindjee, Sanjay
2012-03-01
A new analytical approach is presented to predict mask deformation during electro-static chucking in next generation extreme-ultraviolet-lithography (EUVL). Given an arbitrary profile measurement of the mask and chuck non-flatness, this method has been developed as an alternative to time-consuming finite element simulations for overlay error correction algorithms. We consider the feature transfer of each harmonic component in the profile shapes via linear elasticity theory and demonstrate analytically how high spatial frequencies are filtered. The method is compared to presumably more accurate finite element simulations and has been tested successfully in an overlay error compensation experiment, where the residual error y-component could be reduced by a factor 2. As a side outcome, the formulation provides a tool to estimate the critical pin-size and -pitch such that the distortion on the mask front-side remains within given tolerances. We find for a numerical example that pin-pitches of less than 5 mm will result in a mask pattern-distortion of less than 1 nm if the chucking pressure is below 30 kPa.
NASA Astrophysics Data System (ADS)
Brandstetter, Gerd; Govindjee, Sanjay
2012-10-01
A new analytical approach is presented to predict mask deformation during electrostatic chucking in next-generation extreme-ultraviolet-lithography. Given an arbitrary profile measurement of the mask and chuck nonflatness, this method has been developed as an alternative to time-consuming finite element simulations for overlay error correction algorithms. We consider the feature transfer of each harmonic component in the profile shapes via linear elasticity theory and demonstrate analytically how high spatial frequencies are filtered. The method is compared to presumably more accurate finite element simulations and has been tested successfully in an overlay error compensation experiment, where the residual error y-component could be reduced by a factor of 2. As a side outcome, the formulation provides a tool to estimate the critical pin-size and -pitch such that the distortion on the mask front-side remains within given tolerances. We find for a numerical example that pin-pitches of less than 5 mm will result in a mask pattern distortion of less than 1 nm if the chucking pressure is below 30 kPa.
Pagani, Luca; Schiffels, Stephan; Gurdasani, Deepti; Danecek, Petr; Scally, Aylwyn; Chen, Yuan; Xue, Yali; Haber, Marc; Ekong, Rosemary; Oljira, Tamiru; Mekonnen, Ephrem; Luiselli, Donata; Bradman, Neil; Bekele, Endashaw; Zalloua, Pierre; Durbin, Richard; Kivisild, Toomas; Tyler-Smith, Chris
2015-06-04
The predominantly African origin of all modern human populations is well established, but the route taken out of Africa is still unclear. Two alternative routes, via Egypt and Sinai or across the Bab el Mandeb strait into Arabia, have traditionally been proposed as feasible gateways in light of geographic, paleoclimatic, archaeological, and genetic evidence. Distinguishing among these alternatives has been difficult. We generated 225 whole-genome sequences (225 at 8× depth, of which 8 were increased to 30×; Illumina HiSeq 2000) from six modern Northeast African populations (100 Egyptians and five Ethiopian populations each represented by 25 individuals). West Eurasian components were masked out, and the remaining African haplotypes were compared with a panel of sub-Saharan African and non-African genomes. We showed that masked Northeast African haplotypes overall were more similar to non-African haplotypes and more frequently present outside Africa than were any sets of haplotypes derived from a West African population. Furthermore, the masked Egyptian haplotypes showed these properties more markedly than the masked Ethiopian haplotypes, pointing to Egypt as the more likely gateway in the exodus to the rest of the world. Using five Ethiopian and three Egyptian high-coverage masked genomes and the multiple sequentially Markovian coalescent (MSMC) approach, we estimated the genetic split times of Egyptians and Ethiopians from non-African populations at 55,000 and 65,000 years ago, respectively, whereas that of West Africans was estimated to be 75,000 years ago. Both the haplotype and MSMC analyses thus suggest a predominant northern route out of Africa via Egypt. Copyright © 2015 The Authors. Published by Elsevier Inc. All rights reserved.
SU-E-T-65: A Prospective Trial of Open Face Masks for Head and Neck Radiotherapy
DOE Office of Scientific and Technical Information (OSTI.GOV)
Wiant, D; Squire, S; Maurer, J
Purpose: Open face head and neck masks allow for active patient monitoring during treatment and may reduced claustrophobia and anxiety compared to closed masks. The ability of open masks to limit intrafraction motion and to preserve the patient shape/position from simulation over protracted treatments should be considered. Methods: Thirty-two head and neck patients were prospectively randomized to treatment in a closed mask or a novel open face mask. All patients received daily volumetric imaging. The daily images were automatically rigidly registered to the planning CT’s offline using a commercial image processing tool. The shifts needed to optimize the registration, themore » mutual information coefficient (MI), and the Pearson correlation (PC) coefficients were recorded to evaluate shape preservation. The open group was set-up and monitored with surface imaging at treatment. The real time surface imaging information was recorded to evaluate intrafraction motion. Results: Sixteen patients were included in each group. Evaluations were made over a total of 984 fractions. The mean MI and PC showed significantly higher shape preservation for the open group than for the closed group (p = 0). The mean rotations for the open group were smaller or < 0.15° larger versus the closed group. The mean intrafraction motion for the open group was 0.93 +/−0.99 mm (2 SD). The maximum single fraction displacement was 3.2 mm. Fourteen of 16 patients showed no significant correlation of motion with fraction number (p > 0.05). Conclusion: The open masks preserved shape as well as the closed masks, and they limited motion to < 2 mm for 95% of the treated fractions. These results are consistent over treatment courses of up to 35 fractions. The open mask is suitable for treatment with or without active monitoring. This work was partially supported by Qfix.« less
Method for partially coating laser diode facets
NASA Technical Reports Server (NTRS)
Dholakia, Anil R. (Inventor)
1990-01-01
Bars of integral laser diode devices cleaved from a wafer are placed with their p regions abutting and n regions abutting. A thin BeCu mask having alternate openings and strips of the same width as the end facets is used to mask the n region interfaces so that multiple bars can be partially coated over their exposed p regions with a reflective or partial reflective coating. The partial coating permits identification of the emitting facet from the fully coated back facet during a later device mounting procedure.
Hosseini, Zahra; Liu, Junmin; Solovey, Igor; Menon, Ravi S; Drangova, Maria
2017-04-01
To implement and optimize a new approach for susceptibility-weighted image (SWI) generation from multi-echo multi-channel image data and compare its performance against optimized traditional SWI pipelines. Five healthy volunteers were imaged at 7 Tesla. The inter-echo-variance (IEV) channel combination, which uses the variance of the local frequency shift at multiple echo times as a weighting factor during channel combination, was used to calculate multi-echo local phase shift maps. Linear phase masks were combined with the magnitude to generate IEV-SWI. The performance of the IEV-SWI pipeline was compared with that of two accepted SWI pipelines-channel combination followed by (i) Homodyne filtering (HPH-SWI) and (ii) unwrapping and high-pass filtering (SVD-SWI). The filtering steps of each pipeline were optimized. Contrast-to-noise ratio was used as the comparison metric. Qualitative assessment of artifact and vessel conspicuity was performed and processing time of pipelines was evaluated. The optimized IEV-SWI pipeline (σ = 7 mm) resulted in continuous vessel visibility throughout the brain. IEV-SWI had significantly higher contrast compared with HPH-SWI and SVD-SWI (P < 0.001, Friedman nonparametric test). Residual background fields and phase wraps in HPH-SWI and SVD-SWI corrupted the vessel signal and/or generated vessel-mimicking artifact. Optimized implementation of the IEV-SWI pipeline processed a six-echo 16-channel dataset in under 10 min. IEV-SWI benefits from channel-by-channel processing of phase data and results in high contrast images with an optimal balance between contrast and background noise removal, thereby presenting evidence of importance of the order in which postprocessing techniques are applied for multi-channel SWI generation. 2 J. Magn. Reson. Imaging 2017;45:1113-1124. © 2016 International Society for Magnetic Resonance in Medicine.
Phase effects in masking by harmonic complexes: speech recognition.
Deroche, Mickael L D; Culling, John F; Chatterjee, Monita
2013-12-01
Harmonic complexes that generate highly modulated temporal envelopes on the basilar membrane (BM) mask a tone less effectively than complexes that generate relatively flat temporal envelopes, because the non-linear active gain of the BM selectively amplifies a low-level tone in the dips of a modulated masker envelope. The present study examines a similar effect in speech recognition. Speech reception thresholds (SRTs) were measured for a voice masked by harmonic complexes with partials in sine phase (SP) or in random phase (RP). The masker's fundamental frequency (F0) was 50, 100 or 200 Hz. SRTs were considerably lower for SP than for RP maskers at 50-Hz F0, but the two converged at 100-Hz F0, while at 200-Hz F0, SRTs were a little higher for SP than RP maskers. The results were similar whether the target voice was male or female and whether the masker's spectral profile was flat or speech-shaped. Although listening in the masker dips has been shown to play a large role for artificial stimuli such as Schroeder-phase complexes at high levels, it contributes weakly to speech recognition in the presence of harmonic maskers with different crest factors at more moderate sound levels (65 dB SPL). Copyright © 2013 Elsevier B.V. All rights reserved.
NASA Astrophysics Data System (ADS)
Kumar, Ravi; Bhaduri, Basanta
2017-06-01
In this paper, we propose a new technique for double image encryption in the Fresnel domain using wavelet transform (WT), gyrator transform (GT) and spiral phase masks (SPMs). The two input mages are first phase encoded and each of them are then multiplied with SPMs and Fresnel propagated with distances d1 and d2, respectively. The single-level discrete WT is applied to Fresnel propagated complex images to decompose each into sub-band matrices i.e. LL, HL, LH and HH. Further, the sub-band matrices of two complex images are interchanged after modulation with random phase masks (RPMs) and subjected to inverse discrete WT. The resulting images are then both added and subtracted to get intermediate images which are further Fresnel propagated with distances d3 and d4, respectively. These outputs are finally gyrator transformed with the same angle α to get the encrypted images. The proposed technique provides enhanced security in terms of a large set of security keys. The sensitivity of security keys such as SPM parameters, GT angle α, Fresnel propagation distances are investigated. The robustness of the proposed techniques against noise and occlusion attacks are also analysed. The numerical simulation results are shown in support of the validity and effectiveness of the proposed technique.
Neurophysiological and Behavioural Analysis of Circadian Rhythm Entrainment
2000-03-29
another source of p75- NGFR in the SCN (Bina et al., 1997). Carbachol , a non-specific cholinergic agonist, has been shown to phase shift circadian...has been that the endpoints and species examined have differed among studies. Thus, it appears that carbachol acts via receptors that resemble...mediating the effects of carbachol on behavioral rhythms in hamsters (Keefe et al., 1987) is subject to alternative interpretations (Rusak and Bina
Associative and repetition priming with the repeated masked prime technique: no priming found.
Avons, S E; Russo, Riccardo; Cinel, Caterina; Verolini, Veronica; Glynn, Kevin; McDonald, Rebecca; Cameron, Marie
2009-01-01
Wentura and Frings (2005) reported evidence of subliminal categorical priming on a lexical decision task, using a new method of visual masking in which the prime string consisted of the prime word flanked by random consonants and random letter masks alternated with the prime string on successive refresh cycles. We investigated associative and repetition priming on lexical decision, using the same method of visual masking. Three experiments failed to show any evidence of associative priming, (1) when the prime string was fixed at 10 characters (three to six flanking letters) and (2) when the number of flanking letters were reduced or absent. In all cases, prime detection was at chance level. Strong associative priming was observed with visible unmasked primes, but the addition of flanking letters restricted priming even though prime detection was still high. With repetition priming, no priming effects were found with the repeated masked technique, and prime detection was poor but just above chance levels. We conclude that with repeated masked primes, there is effective visual masking but that associative priming and repetition priming do not occur with experiment-unique prime-target pairs. Explanations for this apparent discrepancy across priming paradigms are discussed. The priming stimuli and prime-target pairs used in this study may be downloaded as supplemental materials from mc.psychonomic-journals.org/content/supplemental.
Atmospheric Science Data Center
2018-06-20
... V1 Level: L2 Platform: DEEP SPACE CLIMATE OBSERVATORY Instrument: Enhanced Polychromatic ... assuming ice phase Cloud Optical Thickness – assuming liquid phase EPIC Cloud Mask Oxygen A-band Cloud Effective Height (in ...
Buffardi, Anne L
2018-04-01
The record of the Millennium Development Goals broadly reflects the trade-offs of disease-specific financing: substantial progress in particular areas, facilitated by time-bound targets that are easy to measure and communicate, which shifted attention and resources away from other areas, masked inequalities and exacerbated fragmentation. In many ways, the Sustainable Development Goals reflect a profound shift towards a more holistic, system-wide approach. To inform responses to this shift, this article builds upon existing work on aggregate trends in donor financing, bringing together what have largely been disparate analyses of sector-wide and disease-specific financing approaches. Looking across the last 26 years, the article examines how international donors have allocated development assistance for health (DAH) between these two approaches and how attempts to bridge them have fared in practice. Since 1990, DAH has overwhelmingly favoured disease-specific earmarks over health sector support, with the latter peaking in 1998. Attempts to integrate system strengthening elements into disease-specific funding mechanisms have varied by disease, and more integrated funding platforms have failed to gain traction. Health sector support largely remains an unfulfilled promise: proportionately low amounts (albeit absolute increases) which have been inconsistently allocated, and the overall approach inconsistently applied in practice. Thus, the expansive orientation of the Sustainable Development Goals runs counter to trends over the last several decades. Financing proposals and efforts to adapt global health institutions must acknowledge and account for the persistent challenges in the financing and implementation of integrated, cross-sector policies. National and subnational experimentation may offer alternatives within and beyond the health sector.
NASA Astrophysics Data System (ADS)
Murakami, Naoshi; Guyon, Olivier; Martinache, Frantz; Matsuo, Taro; Yokochi, Kaito; Nishikawa, Jun; Tamura, Motohide; Kurokawa, Takashi; Baba, Naoshi; Vogt, Frédéric; Garrel, Vincent; Yoshikawa, Takashi
2010-07-01
An eight-octant phase-mask (EOPM) coronagraph is one of the highest performance coronagraphic concepts, and attains simultaneously high throughput, small inner working angle, and large discovery space. However, its application to ground-based telescopes such as the Subaru Telescope is challenging due to pupil geometry (thick spider vanes and large central obstruction) and residual tip-tilt errors. We show that the Subaru Coronagraphic Extreme Adaptive Optics (SCExAO) system, scheduled to be installed onto the Subaru Telescope, includes key technologies which can solve these problems. SCExAO uses a spider removal plate which translates four parts of the pupil with tilted plane parallel plates. The pupil central obstruction can be removed by a pupil remapping system similar to the PIAA optics already in the SCExAO system, which could be redesigned with no amplitude apodization. The EOPM is inserted in the focal plane to divide a stellar image into eight-octant regions, and introduces a π-phase difference between adjacent octants. This causes a self-destructive interference inside the pupil area on a following reimaged pupil plane. By using a reflective mask instead of a conventional opaque Lyot stop, the stellar light diffracted outside the pupil can be used for a coronagraphic low-order wave-front sensor to accurately measure and correct tip-tilt errors. A modified inverse-PIAA system, located behind the reimaged pupil plane, is used to remove off-axis aberrations and deliver a wide field of view. We show that this EOPM coronagraph architecture enables high contrast imaging at small working angle on the Subaru Telescope. Our approach could be generalized to other phase-mask type coronagraphs and other ground-based telescopes.
Method and apparatus for monitoring and measuring the surface tension of a fluid using fiber optics
Abraham, B.M.; Ketterson, J.B.; Bohanon, T.M.; Mikrut, J.M.
1994-04-12
A non-contact method and apparatus are described for measuring and monitoring the surface of a fluid using fiber optics and interferometric detection to permit measurement of mechanical characteristics of fluid surfaces. The apparatus employs an alternating electric field gradient for generating a capillary wave on the surface of the fluid. A fiber optic coupler and optical fiber directs a portion of a laser beam onto the surface of the fluid, another portion of the laser beam onto the photo sensor, and directs light reflected from the surface of the fluid onto the photo sensor. The output of the photo sensor is processed and coupled to a phase sensitive detector to permit measurement of phase shift between the drive signal creating the capillary wave and the detected signal. This phase shift information is then used to determine mechanical properties of the fluid surface such as surface tension, surface elasticity, and surface inhomogeneity. The resulting test structure is easily made compact, portable, and easy to align and use. 4 figures.
Bacterial cellulose skin masks-Properties and sensory tests.
Pacheco, Guilherme; de Mello, Carolina Véspoli; Chiari-Andréo, Bruna Galdorfini; Isaac, Vera Lucia Borges; Ribeiro, Sidney José Lima; Pecoraro, Édison; Trovatti, Eliane
2017-09-29
Bacterial cellulose (BC) is a versatile material produced by microorganisms in the form of a membranous hydrogel, totally biocompatible, and endowed with high mechanical strength. Its high water-holding capacity based on its highly porous nanofibrillar structure allows BC to incorporate and to release substances very fast, thus being suitable for the preparation of skincare masks. The preparation and characterization of cosmetic masks based on BC membranes and active cosmetics. The masks were prepared by the simple incorporation of the cosmetic actives into BC membranes, used as a swelling matrix. The masks were characterized by Fourier transform infrared (FTIR), scanning electron microscopy (SEM), sensory tests, and skin moisture tests on volunteers. The results of sensory tests revealed the good performance of BC, being considered effective by the panel of volunteers, specially for adhesion to the skin (7.7 at the score scale), and improvement of the skin moisture (the hydration effect increased 76% in 75% of the volunteers that used vegetable extract mask formulation [VEM]), or a decrease in skin hydration (80% of the volunteers showed 32.6% decrease on skin hydration using propolis extract formulation [PEM] treatment), indicating the BC nanofiber membranes can be used to skincare applications. The results demonstrate the BC can be used as an alternative support for cosmetic actives for skin treatment. © 2017 Wiley Periodicals, Inc.
Feedforward and feedback control in apraxia of speech: effects of noise masking on vowel production.
Maas, Edwin; Mailend, Marja-Liisa; Guenther, Frank H
2015-04-01
This study was designed to test two hypotheses about apraxia of speech (AOS) derived from the Directions Into Velocities of Articulators (DIVA) model (Guenther et al., 2006): the feedforward system deficit hypothesis and the feedback system deficit hypothesis. The authors used noise masking to minimize auditory feedback during speech. Six speakers with AOS and aphasia, 4 with aphasia without AOS, and 2 groups of speakers without impairment (younger and older adults) participated. Acoustic measures of vowel contrast, variability, and duration were analyzed. Younger, but not older, speakers without impairment showed significantly reduced vowel contrast with noise masking. Relative to older controls, the AOS group showed longer vowel durations overall (regardless of masking condition) and a greater reduction in vowel contrast under masking conditions. There were no significant differences in variability. Three of the 6 speakers with AOS demonstrated the group pattern. Speakers with aphasia without AOS did not differ from controls in contrast, duration, or variability. The greater reduction in vowel contrast with masking noise for the AOS group is consistent with the feedforward system deficit hypothesis but not with the feedback system deficit hypothesis; however, effects were small and not present in all individual speakers with AOS. Theoretical implications and alternative interpretations of these findings are discussed.
Feedforward and Feedback Control in Apraxia of Speech: Effects of Noise Masking on Vowel Production
Mailend, Marja-Liisa; Guenther, Frank H.
2015-01-01
Purpose This study was designed to test two hypotheses about apraxia of speech (AOS) derived from the Directions Into Velocities of Articulators (DIVA) model (Guenther et al., 2006): the feedforward system deficit hypothesis and the feedback system deficit hypothesis. Method The authors used noise masking to minimize auditory feedback during speech. Six speakers with AOS and aphasia, 4 with aphasia without AOS, and 2 groups of speakers without impairment (younger and older adults) participated. Acoustic measures of vowel contrast, variability, and duration were analyzed. Results Younger, but not older, speakers without impairment showed significantly reduced vowel contrast with noise masking. Relative to older controls, the AOS group showed longer vowel durations overall (regardless of masking condition) and a greater reduction in vowel contrast under masking conditions. There were no significant differences in variability. Three of the 6 speakers with AOS demonstrated the group pattern. Speakers with aphasia without AOS did not differ from controls in contrast, duration, or variability. Conclusion The greater reduction in vowel contrast with masking noise for the AOS group is consistent with the feedforward system deficit hypothesis but not with the feedback system deficit hypothesis; however, effects were small and not present in all individual speakers with AOS. Theoretical implications and alternative interpretations of these findings are discussed. PMID:25565143
Klarhöfer, Markus; Dilharreguy, Bixente; van Gelderen, Peter; Moonen, Chrit T W
2003-10-01
A 3D sequence for dynamic susceptibility imaging is proposed which combines echo-shifting principles (such as PRESTO), sensitivity encoding (SENSE), and partial-Fourier acquisition. The method uses a moderate SENSE factor of 2 and takes advantage of an alternating partial k-space acquisition in the "slow" phase encode direction allowing an iterative reconstruction using high-resolution phase estimates. Offering an isotropic spatial resolution of 4 x 4 x 4 mm(3), the novel sequence covers the whole brain including parts of the cerebellum in 0.5 sec. Its temporal signal stability is comparable to that of a full-Fourier, full-FOV EPI sequence having the same dynamic scan time but much less brain coverage. Initial functional MRI experiments showed consistent activation in the motor cortex with an average signal change slightly less than that of EPI. Copyright 2003 Wiley-Liss, Inc.
Emotional conditioning to masked stimuli and modulation of visuospatial attention.
Beaver, John D; Mogg, Karin; Bradley, Brendan P
2005-03-01
Two studies investigated the effects of conditioning to masked stimuli on visuospatial attention. During the conditioning phase, masked snakes and spiders were paired with a burst of white noise, or paired with an innocuous tone, in the conditioned stimulus (CS)+ and CS- conditions, respectively. Attentional allocation to the CSs was then assessed with a visual probe task, in which the CSs were presented unmasked (Experiment 1) or both unmasked and masked (Experiment 2), together with fear-irrelevant control stimuli (flowers and mushrooms). In Experiment 1, participants preferentially allocated attention to CS+ relative to control stimuli. Experiment 2 suggested that this attentional bias depended on the perceived aversiveness of the unconditioned stimulus and did not require conscious recognition of the CSs during both acquisition and expression. Copyright 2005 APA, all rights reserved.
Sutojo, Sarinah; van de Par, Steven; Schoenmaker, Esther
2018-06-01
In situations with competing talkers or in the presence of masking noise, speech intelligibility can be improved by spatially separating the target speaker from the interferers. This advantage is generally referred to as spatial release from masking (SRM) and different mechanisms have been suggested to explain it. One proposed mechanism to benefit from spatial cues is the binaural masking release, which is purely stimulus driven. According to this mechanism, the spatial benefit results from differences in the binaural cues of target and masker, which need to appear simultaneously in time and frequency to improve the signal detection. In an alternative proposed mechanism, the differences in the interaural cues improve the segregation of auditory streams, a process, which involves top-down processing rather than being purely stimulus driven. Other than the cues that produce binaural masking release, the interaural cue differences between target and interferer required to improve stream segregation do not have to appear simultaneously in time and frequency. This study is concerned with the contribution of binaural masking release to SRM for three masker types that differ with respect to the amount of energetic masking they exert. Speech intelligibility was measured, employing a stimulus manipulation that inhibits binaural masking release, and analyzed with a metric to account for the number of better-ear glimpses. Results indicate that the contribution of the stimulus-driven binaural masking release plays a minor role while binaural stream segregation and the availability of glimpses in the better ear had a stronger influence on improving the speech intelligibility. This article is protected by copyright. All rights reserved. This article is protected by copyright. All rights reserved.
Preis, Maren; Grother, Leon; Axe, Philip; Breitkreutz, Jörg
2015-08-01
The use of solid oral dosage forms is typically favored with regard to stability and ease of administration. The aim of this study was to investigate whether cyclodextrins (CD) or ion exchange resins (IER) could be used to taste-mask cetirizine HCl when formulated in a freeze-dried oral formulation. The oral lyophilisates were produced using the Zydis(®) technology that offer the opportunity to produce the dosage form directly in the aluminum laminate blister packs. This study confirmed that a pre-formed resinate of cetirizine HCl and various cyclodextrins can be successfully incorporated into the Zydis(®) oral lyophilisate. A chemically stable product with acceptable release profile was obtained in the case of cyclodextrin. This study has also demonstrated that the Insent(®) taste sensing system is a useful technique for predicting the taste-masking potential of Zydis(®) formulations. The electronic taste sensing system (e-tongue) data can be used to provide guidance on the selection of taste-masked formulations. Principal component analysis (PCA) of sensor data by plotting the PCA scores revealed the effects of used taste-masking techniques on the e-tongue sensors, indicating the successful taste improvement. The PCA plot of the taste sensor data revealed larger distances between the non-taste-masked sample and the CD- and IER-loaded samples, and the shift toward the drug-free formulations and excipient signals indicates a modification of the product taste. The human taste trial confirms the acceptability of the selected promising formulations. The taste evaluation results showed that an effectively taste-masked formulation has been achieved using β-cyclodextrin and cherry/sucralose flavor system with over 80% of volunteers finding the tablet to be acceptable. Copyright © 2015 Elsevier B.V. All rights reserved.
Post-coronagraphic tip-tilt sensing for vortex phase masks: The QACITS technique
NASA Astrophysics Data System (ADS)
Huby, E.; Baudoz, P.; Mawet, D.; Absil, O.
2015-12-01
Context. Small inner working angle coronagraphs, such as the vortex phase mask, are essential to exploit the full potential of ground-based telescopes in the context of exoplanet detection and characterization. However, the drawback of this attractive feature is a high sensitivity to pointing errors, which degrades the performance of the coronagraph. Aims: We propose a tip-tilt retrieval technique based on the analysis of the final coronagraphic image, hereafter called Quadrant Analysis of Coronagraphic Images for Tip-tilt Sensing (QACITS). Methods: Under the assumption of small phase aberrations, we show that the behavior of the vortex phase mask can be simply described from the entrance pupil to the Lyot stop plane with Zernike polynomials. This convenient formalism is used to establish the theoretical basis of the QACITS technique. We performed simulations to demonstrate the validity and limits of the technique, including the case of a centrally obstructed pupil. Results: The QACITS technique principle is validated with experimental results in the case of an unobstructed circular aperture, as well as simulations in presence of a central obstruction. The typical configuration of the Keck telescope (24% central obstruction) has been simulated with additional high order aberrations. In these conditions, our simulations show that the QACITS technique is still adapted to centrally obstructed pupils and performs tip-tilt retrieval with a precision of 5 × 10-2λ/D when wavefront errors amount to λ/ 14 rms and 10-2λ/D for λ/ 70 rms errors (with λ the wavelength and D the pupil diameter). Conclusions: We have developed and demonstrated a tip-tilt sensing technique for vortex coronagraphs. The implementation of the QACITS technique is based on the analysis of the scientific image and does not require any modification of the original setup. Current facilities equipped with a vortex phase mask can thus directly benefit from this technique to improve the contrast performance close to the axis.
Ghai, Babita; Sethi, Sameer; Ram, Jagat; Wig, Jyotsna
2013-02-01
Clinical end points are often used to guide inflation and adequacy of cuff seal after laryngeal mask airway placement. However, clinical end points for cuff inflation have been shown to have significantly higher intracuff pressure. The adjusted cuff pressure between 55 and 60 cm H(2)O causes significantly better seal of laryngeal mask airway. We prospectively assessed the cuff pressures generated by cuff inflation guided by clinical end points, and the actual volume of air required to achieve cuff pressures between 55 and 60 cm H(2)O for sizes 1-2.5 reusable classic laryngeal mask airway. Two hundred and three ASA I and II children undergoing elective cataract surgery requiring general anesthesia receiving laryngeal mask airway sizes 1-2.5 were recruited to this study. The laryngeal mask airway was placed using standard technique. After insertion of laryngeal mask airway, the cuff was slowly inflated until a slight outward shift of device was noted. Cuff pressures were measured using calibrated hand held Portex Cuff Inflator Pressure Gauge (Portex Limited, Hythe, Kent, UK). If the cuff pressure was >60 cm H(2)O, the cuff was deflated to achieve a cuff pressure of 55-60 cm H(2)O. The volume of air required to achieve this pressure was recorded. The volume of air required to achieve the pressure between 55 and 60 cm H(2)O in laryngeal mask airway size 1, 1.5, 2.0, and 2.5 were 2.750 ± 0.2565, 4.951 ± 0.5378, 6.927 ± 0.6328, and 10.208 ± 1.4535 ml, respectively. The difference between the initial and the final cuff volumes and pressures in all laryngeal mask airway sizes were statistically significant(P = 0.000). Lower cuff volumes are required to achieve a pressure of 60 cm H(2)O than those required if clinical end points are used as a sole guide for determining cuff inflation for patients receiving pediatric laryngeal mask airways. © 2012 Blackwell Publishing Ltd.
NASA Astrophysics Data System (ADS)
Ma, Lihong; Jin, Weimin
2018-01-01
A novel symmetric and asymmetric hybrid optical cryptosystem is proposed based on compressive sensing combined with computer generated holography. In this method there are six encryption keys, among which two decryption phase masks are different from the two random phase masks used in the encryption process. Therefore, the encryption system has the feature of both symmetric and asymmetric cryptography. On the other hand, because computer generated holography can flexibly digitalize the encrypted information and compressive sensing can significantly reduce data volume, what is more, the final encryption image is real function by phase truncation, the method favors the storage and transmission of the encryption data. The experimental results demonstrate that the proposed encryption scheme boosts the security and has high robustness against noise and occlusion attacks.
Automatic classification of blank substrate defects
NASA Astrophysics Data System (ADS)
Boettiger, Tom; Buck, Peter; Paninjath, Sankaranarayanan; Pereira, Mark; Ronald, Rob; Rost, Dan; Samir, Bhamidipati
2014-10-01
Mask preparation stages are crucial in mask manufacturing, since this mask is to later act as a template for considerable number of dies on wafer. Defects on the initial blank substrate, and subsequent cleaned and coated substrates, can have a profound impact on the usability of the finished mask. This emphasizes the need for early and accurate identification of blank substrate defects and the risk they pose to the patterned reticle. While Automatic Defect Classification (ADC) is a well-developed technology for inspection and analysis of defects on patterned wafers and masks in the semiconductors industry, ADC for mask blanks is still in the early stages of adoption and development. Calibre ADC is a powerful analysis tool for fast, accurate, consistent and automatic classification of defects on mask blanks. Accurate, automated classification of mask blanks leads to better usability of blanks by enabling defect avoidance technologies during mask writing. Detailed information on blank defects can help to select appropriate job-decks to be written on the mask by defect avoidance tools [1][4][5]. Smart algorithms separate critical defects from the potentially large number of non-critical defects or false defects detected at various stages during mask blank preparation. Mechanisms used by Calibre ADC to identify and characterize defects include defect location and size, signal polarity (dark, bright) in both transmitted and reflected review images, distinguishing defect signals from background noise in defect images. The Calibre ADC engine then uses a decision tree to translate this information into a defect classification code. Using this automated process improves classification accuracy, repeatability and speed, while avoiding the subjectivity of human judgment compared to the alternative of manual defect classification by trained personnel [2]. This paper focuses on the results from the evaluation of Automatic Defect Classification (ADC) product at MP Mask Technology Center (MPMask). The Calibre ADC tool was qualified on production mask blanks against the manual classification. The classification accuracy of ADC is greater than 95% for critical defects with an overall accuracy of 90%. The sensitivity to weak defect signals and locating the defect in the images is a challenge we are resolving. The performance of the tool has been demonstrated on multiple mask types and is ready for deployment in full volume mask manufacturing production flow. Implementation of Calibre ADC is estimated to reduce the misclassification of critical defects by 60-80%.
Tiwari, Roshan V.; Polk, Ashley N.; Patil, Hemlata; Ye, Xingyou; Pimparade, Manjeet B.; Repka, Michael A.
2017-01-01
Developing a pediatric oral formulation with an age-appropriate dosage form and taste masking of naturally bitter active pharmaceutical ingredients (APIs) are key challenges for formulation scientists. Several techniques are used for taste masking of bitter APIs to improve formulation palatability; however, not all the techniques are applicable to pediatric dosage forms because of the limitations on the kind and concentration of the excipients that can be used. Hot-melt extrusion (HME) technology is used successfully for taste masking of bitter APIs, and overcomes some of the limitations of the existing taste masking techniques. Likewise, analytical taste assessment is an important quality control parameter evaluated by several in vivo and in vitro methods, such as the human taste panel, electrophysiological methods, electronic sensor, and animal preference tests to aid in selecting a taste-masked formulation. However, the most appropriate in-vivo method to assess the taste-masking efficacy of pediatric formulations remains unknown, because it is not known to what extent the human taste panel/electronic tongue can predict the palatability in the pediatric patients. The purpose of this study was to develop taste-masked caffeine citrate extrudates via HME, and to demonstrate the wide applicability of a single bottle-test rat model to record and compare the volume consumed of the taste-masked solutions to that of the pure API. Thus, this rat model can be considered as a low-cost alternative taste-assessment method to the most commonly used expensive human taste panel/electronic tongue method for pediatric formulations. PMID:26573158
Zernike Wavefront Sensor Modeling Development for LOWFS on WFIRST-AFTA
NASA Technical Reports Server (NTRS)
Wang, Xu; Wallace, J. Kent; Shi, Fang
2015-01-01
WFIRST-AFTA design makes use of an existing 2.4m telescope for direct imaging of exoplanets. To maintain the high contrast needed for the coronagraph, wavefront error (WFE) of the optical system needs to be continuously sensed and controlled. Low Order Wavefront Sensing (LOWFS) uses the rejected starlight from an immediate focal plane to sense wavefront changes (mostly thermally induced low order WFE) by combining the LOWFS mask (a phase plate located at the small center region with reflective layer) with the starlight rejection masks, i.e. Hybrid Lyot Coronagraph (HLC)'s occulter or Shaped Pupil Coronagraph (SPC)'s field stop. Zernike wavefront sensor (ZWFS) measures phase via the phase-contrast method and is known to be photon noise optimal for measuring low order aberrations. Recently, ZWFS was selected as the baseline LOWFS technology on WFIST/AFTA for its good sensitivity, accuracy, and its easy integration with the starlight rejection mask. In this paper, we review the theory of ZWFS operation, describe the ZWFS algorithm development, and summarize various numerical sensitivity studies on the sensor performance. In the end, the predicted sensor performance on SPC and HLC configurations are presented.
Wutz, Andreas; Weisz, Nathan; Braun, Christoph; Melcher, David
2014-01-22
Dynamic vision requires both stability of the current perceptual representation and sensitivity to the accumulation of sensory evidence over time. Here we study the electrophysiological signatures of this intricate balance between temporal segregation and integration in vision. Within a forward masking paradigm with short and long stimulus onset asynchronies (SOA), we manipulated the temporal overlap of the visual persistence of two successive transients. Human observers enumerated the items presented in the second target display as a measure of the informational capacity read-out from this partly temporally integrated visual percept. We observed higher β-power immediately before mask display onset in incorrect trials, in which enumeration failed due to stronger integration of mask and target visual information. This effect was timescale specific, distinguishing between segregation and integration of visual transients that were distant in time (long SOA). Conversely, for short SOA trials, mask onset evoked a stronger visual response when mask and targets were correctly segregated in time. Examination of the target-related response profile revealed the importance of an evoked α-phase reset for the segregation of those rapid visual transients. Investigating this precise mapping of the temporal relationships of visual signals onto electrophysiological responses highlights how the stream of visual information is carved up into discrete temporal windows that mediate between segregated and integrated percepts. Fragmenting the stream of visual information provides a means to stabilize perceptual events within one instant in time.
Kernel-Phase Interferometry for Super-Resolution Detection of Faint Companions
NASA Astrophysics Data System (ADS)
Factor, Samuel M.; Kraus, Adam L.
2017-01-01
Direct detection of close in companions (exoplanets or binary systems) is notoriously difficult. While coronagraphs and point spread function (PSF) subtraction can be used to reduce contrast and dig out signals of companions under the PSF, there are still significant limitations in separation and contrast. Non-redundant aperture masking (NRM) interferometry can be used to detect companions well inside the PSF of a diffraction limited image, though the mask discards ˜95% of the light gathered by the telescope and thus the technique is severely flux limited. Kernel-phase analysis applies interferometric techniques similar to NRM to a diffraction limited image utilizing the full aperture. Instead of non-redundant closure-phases, kernel-phases are constructed from a grid of points on the full aperture, simulating a redundant interferometer. I have developed my own faint companion detection pipeline which utilizes an Bayesian analysis of kernel-phases. I have used this pipeline to search for new companions in archival images from HST/NICMOS in order to constrain planet and binary formation models at separations inaccessible to previous techniques. Using this method, it is possible to detect a companion well within the classical λ/D Rayleigh diffraction limit using a fraction of the telescope time as NRM. This technique can easily be applied to archival data as no mask is needed and will thus make the detection of close in companions cheap and simple as no additional observations are needed. Since the James Webb Space Telescope (JWST) will be able to perform NRM observations, further development and characterization of kernel-phase analysis will allow efficient use of highly competitive JWST telescope time.
Kernel-Phase Interferometry for Super-Resolution Detection of Faint Companions
NASA Astrophysics Data System (ADS)
Factor, Samuel
2016-10-01
Direct detection of close in companions (binary systems or exoplanets) is notoriously difficult. While chronagraphs and point spread function (PSF) subtraction can be used to reduce contrast and dig out signals of companions under the PSF, there are still significant limitations in separation and contrast. While non-redundant aperture masking (NRM) interferometry can be used to detect companions well inside the PSF of a diffraction limited image, the mask discards 95% of the light gathered by the telescope and thus the technique is severely flux limited. Kernel-phase analysis applies interferometric techniques similar to NRM though utilizing the full aperture. Instead of closure-phases, kernel-phases are constructed from a grid of points on the full aperture, simulating a redundant interferometer. I propose to develop my own faint companion detection pipeline which utilizes an MCMC analysis of kernel-phases. I will search for new companions in archival images from NIC1 and ACS/HRC in order to constrain binary and planet formation models at separations inaccessible to previous techniques. Using this method, it is possible to detect a companion well within the classical l/D Rayleigh diffraction limit using a fraction of the telescope time as NRM. This technique can easily be applied to archival data as no mask is needed and will thus make the detection of close in companions cheap and simple as no additional observations are needed. Since the James Webb Space Telescope (JWST) will be able to perform NRM observations, further development and characterization of kernel-phase analysis will allow efficient use of highly competitive JWST telescope time.
Alternating-Script Priming in Japanese: Are Katakana and Hiragana Characters Interchangeable?
ERIC Educational Resources Information Center
Perea, Manuel; Nakayama, Mariko; Lupker, Stephen J.
2017-01-01
Models of written word recognition in languages using the Roman alphabet assume that a word's visual form is quickly mapped onto abstract units. This proposal is consistent with the finding that masked priming effects are of similar magnitude from lowercase, uppercase, and alternating-case primes (e.g., beard-BEARD, BEARD-BEARD, and BeArD-BEARD).…
NASA Astrophysics Data System (ADS)
Xu, Xiaoqing; Wang, Yawei; Ji, Ying; Xu, Yuanyuan; Xie, Ming; Han, Hao
2018-05-01
A new approach of quantitative phase imaging using four interferograms with special phase shifts in dual-wavelength in-line phase-shifting interferometry is presented. In this method, positive negative 2π phase shifts are employed to easily separate the incoherent addition of two single-wavelength interferograms by combining the phase-shifting technique with the subtraction procedure, then the quantitative phase at one of both wavelengths can be achieved based on two intensities without the corresponding dc terms by the use of the character of the trigonometric function. The quantitative phase of the other wavelength can be retrieved from two dc-term suppressed intensities obtained by employing the two-step phase-shifting technique or the filtering technique in the frequency domain. The proposed method is illustrated with theory, and its effectiveness is demonstrated by simulation experiments of the spherical cap and the HeLa cell, respectively.
[Laryngeal mask for intubation (Fastrach)].
Añez Simón, C; Boada Pié, S; Solsona Dellá, B
2000-10-01
The laryngeal mask for intubation (MLI), or "Fastrach", is a new device designed by Brain for airway management. The MLI, a modified version of the conventional laryngeal mask, allows for blind intubation through the device using endotracheal tubes up to 8 mm in diameter. Insertion with the head in a neutral position makes this system useful for managing the airway when neck injury is present. The device has been used successfully in patients assessed as having difficult-to-manage airways and its use in emergencies inside or outside the hospital is promising. The MLI has been used with high rates of success in combination with other techniques such as fiberoptic bronchoscopy (success rate 99 to 100%) and transillumination (95 to 100% success rate) in patients whose airways have been considered difficult to manage. Given such high rates of success for MLI placement (95 to 100%) and for blind orotracheal intubation (81 to 100%), the Fastrach may offer an alternative to the conventional laryngeal mask in algorithms for airway management.
Concept of a photon-counting camera based on a diffraction-addressed Gray-code mask
NASA Astrophysics Data System (ADS)
Morel, Sébastien
2004-09-01
A new concept of photon counting camera for fast and low-light-level imaging applications is introduced. The possible spectrum covered by this camera ranges from visible light to gamma rays, depending on the device used to transform an incoming photon into a burst of visible photons (photo-event spot) localized in an (x,y) image plane. It is actually an evolution of the existing "PAPA" (Precision Analog Photon Address) Camera that was designed for visible photons. This improvement comes from a simplified optics. The new camera transforms, by diffraction, each photo-event spot from an image intensifier or a scintillator into a cross-shaped pattern, which is projected onto a specific Gray code mask. The photo-event position is then extracted from the signal given by an array of avalanche photodiodes (or photomultiplier tubes, alternatively) downstream of the mask. After a detailed explanation of this camera concept that we have called "DIAMICON" (DIffraction Addressed Mask ICONographer), we briefly discuss about technical solutions to build such a camera.
Parallel compression/decompression-based datapath architecture for multibeam mask writers
NASA Astrophysics Data System (ADS)
Chaudhary, Narendra; Savari, Serap A.
2017-06-01
Multibeam electron beam systems will be used in the future for mask writing and for complimentary lithography. The major challenges of the multibeam systems are in meeting throughput requirements and in handling the large data volumes associated with writing grayscale data on the wafer. In terms of future communications and computational requirements Amdahl's Law suggests that a simple increase of computation power and parallelism may not be a sustainable solution. We propose a parallel data compression algorithm to exploit the sparsity of mask data and a grayscale video-like representation of data. To improve the communication and computational efficiency of these systems at the write time we propose an alternate datapath architecture partly motivated by multibeam direct write lithography and partly motivated by the circuit testing literature, where parallel decompression reduces clock cycles. We explain a deflection plate architecture inspired by NuFlare Technology's multibeam mask writing system and how our datapath architecture can be easily added to it to improve performance.
Parallel compression/decompression-based datapath architecture for multibeam mask writers
NASA Astrophysics Data System (ADS)
Chaudhary, Narendra; Savari, Serap A.
2017-10-01
Multibeam electron beam systems will be used in the future for mask writing and for complementary lithography. The major challenges of the multibeam systems are in meeting throughput requirements and in handling the large data volumes associated with writing grayscale data on the wafer. In terms of future communications and computational requirements, Amdahl's law suggests that a simple increase of computation power and parallelism may not be a sustainable solution. We propose a parallel data compression algorithm to exploit the sparsity of mask data and a grayscale video-like representation of data. To improve the communication and computational efficiency of these systems at the write time, we propose an alternate datapath architecture partly motivated by multibeam direct-write lithography and partly motivated by the circuit testing literature, where parallel decompression reduces clock cycles. We explain a deflection plate architecture inspired by NuFlare Technology's multibeam mask writing system and how our datapath architecture can be easily added to it to improve performance.
NASA Technical Reports Server (NTRS)
King, Michael D.; Platnick, Steven; Yang, Ping; Arnold, G. Thomas; Gray, Mark A.; Riedi, Jerome C.; Ackerman, Steven A.; Liou, Kuo-Nan
2003-01-01
A multispectral scanning spectrometer was used to obtain measurements of the reflection function and brightness temperature of clouds, sea ice, snow, and tundra surfaces at 50 discrete wavelengths between 0.47 and 14.0 microns. These observations were obtained from the NASA ER-2 aircraft as part of the FIRE Arctic Clouds Experiment, conducted over a 1600 x 500 km region of the north slope of Alaska and surrounding Beaufort and Chukchi Seas between 18 May and 6 June 1998. Multispectral images of the reflection function and brightness temperature in 11 distinct bands of the MODIS Airborne Simulator (MAS) were used to derive a confidence in clear sky (or alternatively the probability of cloud), shadow, and heavy aerosol over five different ecosystems. Based on the results of individual tests run as part of the cloud mask, an algorithm was developed to estimate the phase of the clouds (water, ice, or undetermined phase). Finally, the cloud optical thickness and effective radius were derived for both water and ice clouds that were detected during one flight line on 4 June. This analysis shows that the cloud mask developed for operational use on MODIS, and tested using MAS data in Alaska, is quite capable of distinguishing clouds from bright sea ice surfaces during daytime conditions in the high Arctic. Results of individual tests, however, make it difficult to distinguish ice clouds over snow and sea ice surfaces, so additional tests were added to enhance the confidence in the thermodynamic phase of clouds over the Beaufort Sea. The cloud optical thickness and effective radius retrievals used 3 distinct bands of the MAS, with the newly developed 1.62 and 2.13 micron bands being used quite successfully over snow and sea ice surfaces. These results are contrasted with a MODIS-based algorithm that relies on spectral reflectance at 0.87 and 2.13 micron.
Oxytocin attenuates neural reactivity to masked threat cues from the eyes.
Kanat, Manuela; Heinrichs, Markus; Schwarzwald, Ralf; Domes, Gregor
2015-01-01
The neuropeptide oxytocin has recently been shown to modulate covert attention shifts to emotional face cues and to improve discrimination of masked facial emotions. These results suggest that oxytocin modulates facial emotion processing at early perceptual stages prior to full evaluation of the emotional expression. Here, we used functional magnetic resonance imaging to examine whether oxytocin alters neural responses to backwardly masked angry and happy faces while controlling for attention to the eye vs the mouth region. Intranasal oxytocin administration reduced amygdala reactivity to masked emotions when attending to salient facial features, ie, the eyes of angry faces and the mouth of happy faces. In addition, oxytocin decreased neural responses within the fusiform gyrus and brain stem areas, as well as functional coupling between the amygdala and the fusiform gyrus specifically for threat cues from the eyes. Effects of oxytocin on brain activity were not attributable to differences in behavioral performance, as oxytocin had no impact on mere emotion detection. Our results suggest that oxytocin attenuates neural correlates of early arousal by threat signals from the eye region. As reduced threat sensitivity may increase the likelihood of engaging in social interactions, our findings may have important implications for clinical states of social anxiety.
High-speed optical phase-shifting apparatus
Zortman, William A.
2016-11-08
An optical phase shifter includes an optical waveguide, a plurality of partial phase shifting elements arranged sequentially, and control circuitry electrically coupled to the partial phase shifting elements. The control circuitry is adapted to provide an activating signal to each of the N partial phase shifting elements such that the signal is delayed by a clock cycle between adjacent partial phase shifting elements in the sequence. The transit time for a guided optical pulse train between the input edges of consecutive partial phase shifting elements in the sequence is arranged to be equal to a clock cycle, thereby enabling pipelined processing of the optical pulses.
Beam shuttering interferometer and method
Deason, V.A.; Lassahn, G.D.
1993-07-27
A method and apparatus resulting in the simplification of phase shifting interferometry by eliminating the requirement to know the phase shift between interferograms or to keep the phase shift between interferograms constant. The present invention provides a simple, inexpensive means to shutter each independent beam of the interferometer in order to facilitate the data acquisition requirements for optical interferometry and phase shifting interferometry. By eliminating the requirement to know the phase shift between interferograms or to keep the phase shift constant, a simple, economical means and apparatus for performing the technique of phase shifting interferometry is provide which, by thermally expanding a fiber optical cable changes the optical path distance of one incident beam relative to another.
Beam shuttering interferometer and method
Deason, Vance A.; Lassahn, Gordon D.
1993-01-01
A method and apparatus resulting in the simplification of phase shifting interferometry by eliminating the requirement to know the phase shift between interferograms or to keep the phase shift between interferograms constant. The present invention provides a simple, inexpensive means to shutter each independent beam of the interferometer in order to facilitate the data acquisition requirements for optical interferometry and phase shifting interferometry. By eliminating the requirement to know the phase shift between interferograms or to keep the phase shift constant, a simple, economical means and apparatus for performing the technique of phase shifting interferometry is provide which, by thermally expanding a fiber optical cable changes the optical path distance of one incident beam relative to another.
A study on high NA and evanescent imaging with polarized illumination
NASA Astrophysics Data System (ADS)
Yang, Seung-Hune
Simulation techniques are developed for high NA polarized microscopy with Babinet's principle, partial coherence and vector diffraction for non-periodic geometries. A mathematical model for the Babinet approach is developed and interpreted. Simulation results of the Babinet's principle approach are compared with those of Rigorous Coupled Wave Theory (RCWT) for periodic structures to investigate the accuracy of this approach and its limitations. A microscope system using a special solid immersion lens (SIL) is introduced to image Blu-Ray (BD) optical disc samples without removing the protective cover layer. Aberration caused by the cover layer is minimized with a truncated SIL. Sub-surface imaging simulation is achieved by RCWT, partial coherence, vector diffraction and Babinet's Principle. Simulated results are compared with experimental images and atomic force microscopy (AFM) measurement. A technique for obtaining native and induced using a significant amount of evanescent energy is described for a solid immersion lens (SIL) microscope. Characteristics of native and induced polarization images for different object structures and materials are studied in detail. Experiments are conducted with a NA = 1.48 at lambda = 550nm microscope. Near-field images are simulated and analyzed with an RCWT approach. Contrast curve versus object spatial frequency calculations are compared with experimental measurements. Dependencies of contrast versus source polarization angles and air gap for native and induced polarization image profiles are evaluated. By using the relationship between induced polarization and topographical structure, an induced polarization image of an alternating phase shift mask (PSM) is converted into a topographical image, which shows very good agreement with AFM measurement. Images of other material structures include a dielectric grating, chrome-on-glass grating, silicon CPU structure, BD-R and BD-ROM.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Drees, A.; Biscardi, C.; Curcio, T.
2015-01-07
The protection of the RHIC experimental detectors from damage due to beam hitting close upstream elements in cases of abort kicker prefires requires some dedicated precautionary measures with two general options: to bring the beam close to a limiting aperture (i.e. the beam pipe wall), as far upstream of the detector components as possible or, alternatively, to bring a limiting aperture close to the circulating beam. During the FY 2014 RHIC Heavy Ion run the first option was chosen because of the limited time available for preparation before the start of the run. For future runs the second option, inmore » this case the installation of dual-sided movable masks, is preferred. The installation of the masks, one per ring, is planned before the start of the FY 2015 run.« less
Impact of the flu mask regulation on health care personnel influenza vaccine acceptance rates.
Edwards, Frances; Masick, Kevin D; Armellino, Donna
2016-10-01
Achieving high vaccination rates of health care personnel (HCP) is critical in preventing influenza transmission from HCP to patients and from patients to HCP; however, acceptance rates remain low. In 2013, New York State adopted the flu mask regulation, requiring unvaccinated HCP to wear a mask when in areas where patients are present. The purpose of this study assessed the impact of the flu mask regulation on the HCP influenza vaccination rate. A 13-question survey was distributed electronically and manually to the HCP to examine their knowledge of influenza transmission and the influenza vaccine and their personal vaccine acceptance history and perception about the use of the mask while working if not vaccinated. There were 1,905 respondents; 87% accepted the influenza vaccine, and 63% were first-time recipients who agreed the regulation influenced their vaccination decision. Of the respondents who declined the vaccine, 72% acknowledge HCP are at risk for transmitting influenza to patients, and 56% reported they did not receive enough information to make an educated decision. The flu mask protocol may have influenced HCP's choice to be vaccinated versus wearing a mask. The study findings supported that HCP may not have adequate knowledge on the morbidity and mortality associated with influenza. Regulatory agencies need to consider an alternative approach to increase HCP vaccination, such as mandating the influenza vaccine for HCP. Copyright © 2016 Association for Professionals in Infection Control and Epidemiology, Inc. Published by Elsevier Inc. All rights reserved.
Mukerji, Shohini; MacIntyre, C Raina; Seale, Holly; Wang, Quanyi; Yang, Peng; Wang, Xiaoli; Newall, Anthony T
2017-07-03
There are substantial differences between the costs of medical masks and N95 respirators. Cost-effectiveness analysis is required to assist decision-makers evaluating alternative healthcare worker (HCW) mask/respirator strategies. This study aims to compare the cost-effectiveness of N95 respirators and medical masks for protecting HCWs in Beijing, China. We developed a cost-effectiveness analysis model utilising efficacy and resource use data from two cluster randomised clinical trials assessing various mask/respirator strategies conducted in HCWs in Level 2 and 3 Beijing hospitals for the 2008-09 and 2009-10 influenza seasons. The main outcome measure was the incremental cost-effectiveness ratio (ICER) per clinical respiratory illness (CRI) case prevented. We used a societal perspective which included intervention costs, the healthcare costs of CRI in HCWs and absenteeism costs. The incremental cost to prevent a CRI case with continuous use of N95 respirators when compared to medical masks ranged from US $490-$1230 (approx. 3000-7600 RMB). One-way sensitivity analysis indicated that the CRI attack rate and intervention effectiveness had the greatest impact on cost-effectiveness. The determination of cost-effectiveness for mask/respirator strategies will depend on the willingness to pay to prevent a CRI case in a HCW, which will vary between countries. In the case of a highly pathogenic pandemic, respirator use in HCWs would likely be a cost-effective intervention.
NASA Astrophysics Data System (ADS)
Holland, Katharina; van Gils, Carla H.; Wanders, Johanna OP; Mann, Ritse M.; Karssemeijer, Nico
2016-03-01
The sensitivity of mammograms is low for women with dense breasts, since cancers may be masked by dense tissue. In this study, we investigated methods to identify women with density patterns associated with a high masking risk. Risk measures are derived from volumetric breast density maps. We used the last negative screening mammograms of 93 women who subsequently presented with an interval cancer (IC), and, as controls, 930 randomly selected normal screening exams from women without cancer. Volumetric breast density maps were computed from the mammograms, which provide the dense tissue thickness at each location. These were used to compute absolute and percentage glandular tissue volume. We modeled the masking risk for each pixel location using the absolute and percentage dense tissue thickness and we investigated the effect of taking the cancer location probability distribution (CLPD) into account. For each method, we selected cases with the highest masking measure (by thresholding) and computed the fraction of ICs as a function of the fraction of controls selected. The latter can be interpreted as the negative supplemental screening rate (NSSR). Between the models, when incorporating CLPD, no significant differences were found. In general, the methods performed better when CLPD was included. At higher NSSRs some of the investigated masking measures had a significantly higher performance than volumetric breast density. These measures may therefore serve as an alternative to identify women with a high risk for a masked cancer.
Assisted suicide by oxygen deprivation with helium at a Swiss right-to-die organisation.
Ogden, Russel D; Hamilton, William K; Whitcher, Charles
2010-03-01
In Switzerland, right-to-die organisations assist their members with suicide by lethal drugs, usually barbiturates. One organisation, Dignitas, has experimented with oxygen deprivation as an alternative to sodium pentobarbital. To analyse the process of assisted suicide by oxygen deprivation with helium and a common face mask and reservoir bag. This study examined four cases of assisted suicide by oxygen deprivation using helium delivered via a face mask. Videos of the deaths were provided by the Zurich police. Dignitas provided protocol and consent information. One man and three women were assisted to death by oxygen deprivation. There was wide variation in the time to unconsciousness and the time to death, probably due to the poor mask fit. Swiss law prevented attendants from effectively managing the face mask apparatus. Purposeless movements of the extremities were disconcerting for Dignitas attendants, who are accustomed to assisting suicide with barbiturates. None of the dying individuals attempted self-rescue. The dying process of oxygen deprivation with helium is potentially quick and appears painless. It also bypasses the prescribing role of physicians, effectively demedicalising assisted suicide. Oxygen deprivation with a face mask is not acceptable because leaks are difficult to control and it may not eliminate rebreathing. These factors will extend time to unconsciousness and time to death. A hood method could reduce the problem of mask fit. With a hood, a flow rate of helium sufficient to provide continuous washout of expired gases would remedy problems observed with the mask.
Stress engineering in GaN structures grown on Si(111) substrates by SiN masking layer application
DOE Office of Scientific and Technical Information (OSTI.GOV)
Szymański, Tomasz, E-mail: tomasz.szymanski@pwr.edu.pl; Wośko, Mateusz; Paszkiewicz, Bogdan
2015-07-15
GaN layers without and with an in-situ SiN mask were grown by using metal organic vapor phase epitaxy for three different approaches used in GaN on silicon(111) growth, and the physical and optical properties of the GaN layers were studied. For each approach applied, GaN layers of 1.4 μm total thickness were grown, using silan SiH{sub 4} as Si source in order to grow Si{sub x}N{sub x} masking layer. The optical micrographs, scanning electron microscope images, and atomic force microscope images of the grown samples revealed cracks for samples without SiN mask, and micropits, which were characteristic for the samples grownmore » with SiN mask. In situ reflectance signal traces were studied showing a decrease of layer coalescence time and higher degree of 3D growth mode for samples with SiN masking layer. Stress measurements were conducted by two methods—by recording micro-Raman spectra and ex-situ curvature radius measurement—additionally PLs spectra were obtained revealing blueshift of PL peak positions with increasing stress. The authors have shown that a SiN mask significantly improves physical and optical properties of GaN multilayer systems reducing stress in comparison to samples grown applying the same approaches but without SiN masking layer.« less
Effects of 10 Hz and 20 Hz Transcranial Alternating Current Stimulation on Automatic Motor Control.
Cappon, Davide; D'Ostilio, Kevin; Garraux, Gaëtan; Rothwell, John; Bisiacchi, Patrizia
2016-01-01
In a masked prime choice reaction task, presentation of a compatible prime increases the reaction time to the following imperative stimulus if the interval between mask and prime is around 80-250 ms. This is thought to be due to automatic suppression of the motor plan evoked by the prime, which delays reaction to the imperative stimulus. Oscillatory activity in motor networks around the beta frequency range of 20 Hz is important in suppression of movement. Transcranial alternating current at 20 Hz may be able to drive oscillations in the beta range. To investigate whether transcranial alternating current stimulation (tACS) at 20 Hz would increase automatic inhibition in a masked prime task. As a control we used 10 Hz tACS. Stimulation was delivered at alpha (10 Hz) and beta (20 Hz) frequency over the supplementary motor area and the primary motor cortex (simultaneous tACS of SMA-M1), which are part of the BG-cortical motor loop, during the execution of the subliminal masked prime left/right choice reaction task. We measured the effects on reaction times. Corticospinal excitability was assessed by measuring the amplitude of motor evoked potentials (MEPs) evoked in the first dorsal interosseous muscle by transcranial magnetic stimulation (TMS) over M1. The 10 and 20-Hz tACS over SMA-M1 had different effects on automatic inhibition. The 20 Hz tACS increased the duration of automatic inhibition whereas it was decreased by 10 Hz tACS. Neurophysiologically, 20 Hz tACS reduced the amplitude of MEPs evoked from M1, whereas there was no change after 10 Hz tACS. Automatic mechanisms of motor inhibition can be modulated by tACS over motor areas of cortex. tACS may be a useful additional tool to investigate the causal links between endogenous brain oscillations and specific cognitive processes. Copyright © 2016 Elsevier Inc. All rights reserved.
Bonds, A B
1989-01-01
Mechanisms supporting orientation selectivity of cat striate cortical cells were studied by stimulation with two superimposed sine-wave gratings of different orientations. One grating (base) generated a discharge of known amplitude which could be modified by the second grating (mask). Masks presented at nonoptimal orientations usually reduced the base-generated response, but the degree of reduction varied widely between cells. Cells with narrow orientation tuning tended to be more susceptible to mask presence than broadly tuned cells; similarly, simple cells generally showed more response reduction than did complex cells. The base and mask stimuli were drifted at different temporal frequencies which, in simple cells, permitted the identification of individual response components from each stimulus. This revealed that the reduction of the base response by the mask usually did not vary regularly with mask orientation, although response facilitation from the mask was orientation selective. In some sharply tuned simple cells, response reduction had clear local maxima near the limits of the cell's orientation-tuning function. Response reduction resulted from a nearly pure rightward shift of the response versus log contrast function. The lowest mask contrast yielding reduction was within 0.1-0.3 log unit of the lowest contrast effective for excitation. The temporal-frequency bandpass of the response-reduction mechanism resembled that of most cortical cells. The spatial-frequency bandpass was much broader than is typical for single cortical cells, spanning essentially the entire visual range of the cat. These findings are compatible with a model in which weak intrinsic orientation-selective excitation is enhanced in two stages: (1) control of threshold by nonorientation-selective inhibition that is continuously dependent on stimulus contrast; and (2) in the more narrowly tuned cells, orientation-selective inhibition that has local maxima serving to increase the slope of the orientation-tuning function.
Invariant correlation to position and rotation using a binary mask applied to binary and gray images
NASA Astrophysics Data System (ADS)
Álvarez-Borrego, Josué; Solorza, Selene; Bueno-Ibarra, Mario A.
2013-05-01
In this paper more alternative ways to generate the binary ring masks are studied and a new methodology is presented when in the analysis the image come with some distortion due to rotation. This new algorithm requires low computational cost. Signature vectors of the target so like signature vectors of the object to be recognized in the problem image are obtained using a binary ring mask constructed in accordance with the real or the imaginary part of their Fourier transform analyzing two different conditions in each one. In this manner, each image target or problem image, will have four unique binary ring masks. The four ways are analyzed and the best is chosen. In addition, due to any image with rotation include some distortion, the best transect is chosen in the Fourier plane in order to obtain the best signature through the different ways to obtain the binary mask. This methodology is applied to two cases: to identify different types of alphabetic letters in Arial font and to identify different fossil diatoms images. Considering the great similarity between diatom images the results obtained are excellent.
Modeling off-frequency binaural masking for short- and long-duration signals.
Nitschmann, Marc; Yasin, Ifat; Henning, G Bruce; Verhey, Jesko L
2017-08-01
Experimental binaural masking-pattern data are presented together with model simulations for 12- and 600-ms signals. The masker was a diotic 11-Hz wide noise centered on 500 Hz. The tonal signal was presented either diotically or dichotically (180° interaural phase difference) with frequencies ranging from 400 to 600 Hz. The results and the modeling agree with previous data and hypotheses; simulations with a binaural model sensitive to monaural modulation cues show that the effect of duration on off-frequency binaural masking-level differences is mainly a result of modulation cues which are only available in the monaural detection of long signals.
Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application
Barbee, Jr., Troy W.; Bajt, Sasa
2002-01-01
The reflectivity and thermal stability of Mo/Si (molybdenum/silicon) multilayer films, used in soft x-ray and extreme ultraviolet region, is enhanced by deposition of a thin layer of boron carbide (e.g., B.sub.4 C) between alternating layers of Mo and Si. The invention is useful for reflective coatings for soft X-ray and extreme ultraviolet optics, multilayer for masks, coatings for other wavelengths and multilayers for masks that are more thermally stable than pure Mo/Si multilayers
NASA Astrophysics Data System (ADS)
Jing, Chao; Liu, Zhongling; Zhou, Ge; Zhang, Yimo
2011-11-01
The nanometer-level precise phase-shift system is designed to realize the phase-shift interferometry in electronic speckle shearography pattern interferometry. The PZT is used as driving component of phase-shift system and translation component of flexure hinge is developed to realize micro displacement of non-friction and non-clearance. Closed-loop control system is designed for high-precision micro displacement, in which embedded digital control system is developed for completing control algorithm and capacitive sensor is used as feedback part for measuring micro displacement in real time. Dynamic model and control model of the nanometer-level precise phase-shift system is analyzed, and high-precision micro displacement is realized with digital PID control algorithm on this basis. It is proved with experiments that the location precision of the precise phase-shift system to step signal of displacement is less than 2nm and the location precision to continuous signal of displacement is less than 5nm, which is satisfied with the request of the electronic speckle shearography and phase-shift pattern interferometry. The stripe images of four-step phase-shift interferometry and the final phase distributed image correlated with distortion of objects are listed in this paper to prove the validity of nanometer-level precise phase-shift system.
Kagerer, Florian A; Viswanathan, Priya; Contreras-Vidal, Jose L; Whitall, Jill
2014-04-01
Unilateral tapping studies have shown that adults adjust to both perceptible and subliminal changes in phase or frequency. This study focuses on the phase responses to abrupt/perceptible and gradual/subliminal changes in auditory-motor relations during alternating bilateral tapping. We investigated these responses in participants with and without good perceptual acuity as determined by an auditory threshold test. Non-musician adults (nine per group) alternately tapped their index fingers in synchrony with auditory cues set at a frequency of 1.4 Hz. Both groups modulated their responses (with no after-effects) to perceptible and to subliminal changes as low as a 5° change in phase. The high-threshold participants were more variable than the adults with low threshold in their responses in the gradual condition set. Both groups demonstrated a synchronization asymmetry between dominant and non-dominant hands associated with the abrupt condition and the later blocks of the gradual condition. Our findings extend previous work in unilateral tapping and suggest (1) no relationship between a discrimination threshold and perceptible auditory-motor integration and (2) a noisier sub-cortical circuitry in those with higher thresholds.
Kagerer, Florian A.; Viswanathan, Priya; Contreras-Vidal, Jose L.; Whitall, Jill
2014-01-01
Unilateral tapping studies have shown that adults adjust to both perceptible and subliminal changes in phase or frequency. This study focuses on the phase responses to abrupt/perceptible and gradual/subliminal changes in auditory-motor relations during alternating bilateral tapping. We investigated these responses in participants with and without good perceptual acuity as determined by an auditory threshold test. Non-musician adults (9 per group) alternately tapped their index fingers in synchrony with auditory cues set at a frequency of 1.4 Hz. Both groups modulated their responses (with no after-effects) to perceptible and to subliminal changes as low as a 5° change in phase. The high threshold participants were more variable than the adults with low threshold in their responses in the gradual condition set (p=0.05). Both groups demonstrated a synchronization asymmetry between dominant and non-dominant hands associated with the abrupt condition and the later blocks of the gradual condition. Our findings extend previous work in unilateral tapping and suggest (1) no relationship between a discrimination threshold and perceptible auditory-motor integration and (2) a noisier subcortical circuitry in those with higher thresholds. PMID:24449013
Creation of hybrid optoelectronic systems for document identification
NASA Astrophysics Data System (ADS)
Muravsky, Leonid I.; Voronyak, Taras I.; Kulynych, Yaroslav P.; Maksymenko, Olexander P.; Pogan, Ignat Y.
2001-06-01
Use of security devices based on a joint transform correlator (JTC) architecture for identification of credit cards and other products is very promising. The experimental demonstration of the random phase encoding technique for security verification shows that hybrid JTCs can be successfully utilized. The random phase encoding technique provides a very high protection level of products and things to be identified. However, the realization of this technique is connected with overcoming of the certain practical problems. To solve some of these problems and simultaneously to improve the security of documents and other products, we propose to use a transformed phase mask (TPM) as an input object in an optical correlator. This mask is synthesized from a random binary pattern (RBP), which is directly used to fabricate a reference phase mask (RPM). To obtain the TPM, we previously separate the RBP on a several parts (for example, K parts) of an arbitrary shape and further fabricate the TPM from this transformed RBP. The fabricated TPM can be bonded as the optical mark to any product or thing to be identified. If the RPM and the TPM are placed on the optical correlator input, the first diffracted order of the output correlation signal is containing the K narrow autocorrelation peaks. The distances between the peaks and the peak's intensities can be treated as the terms of the identification feature vector (FV) for the TPM identification.
Sub-Optical Lithography With Nanometer Definition Masks
NASA Technical Reports Server (NTRS)
Hartley, Frank T.; Malek, Chantal Khan; Neogi, Jayant
2000-01-01
Nanometer feature size lithography represents a major paradigm shift for the electronics and micro-electro-mechanical industries. In this paper, we discuss the capacity of dynamic focused reactive ion beam (FIB) etching systems to undertake direct and highly anisotropic erosion of thick evaporated gold coatings on boron-doped silicon X-ray mask membranes. FIB offers a new level of flexibility in micro fabrication, allowing for fast fabrication of X-ray masks, where pattern definition and surface alteration are combined in the same step which eliminates the whole lithographic process, in particular resist, resist development, electro-deposition and resist removal. Focused ion beam diameters as small as 7 nm can be obtained enabling fabrication well into the sub-20 nm regime. In preliminary demonstrations of this X-ray mask fabrication technique 22 nm width lines were milled directly through 0.9 microns of gold and a miniature mass spectrometer pattern was milled through over 0.5 microns of gold. Also presented are the results of the shadow printing, using the large depth of field of synchrotron high energy parallel X-ray beam, of these and other sub-optical defined patterns in photoresist conformally coated over surfaces of extreme topographical variation. Assuming that electronic circuits and/or micro devices scale proportionally, the surface area of devices processed with X-ray lithography and 20 nm critical dimension X-ray masks would be 0.5% that of contemporary devices (350 nm CD). The 20 CD mask fabrication represents an initial effort - a further factor of three reduction is anticipated which represents a further order-of-magnitude reduction in die area.
MacIntyre, Chandini Raina; Wang, Quanyi; Cauchemez, Simon; Seale, Holly; Dwyer, Dominic E.; Yang, Peng; Shi, Weixian; Gao, Zhanhai; Pang, Xinghuo; Zhang, Yi; Wang, Xiaoli; Duan, Wei; Rahman, Bayzidur; Ferguson, Neil
2011-01-01
Please cite this paper as: MacIntyre et al. (2011) A cluster randomized clinical trial comparing fit‐tested and non‐fit‐tested N95 respirators to medical masks to prevent respiratory virus infection in health care workers. Influenza and Other Respiratory Viruses DOI: 10.1111/j.1750‐2659.2010.00198.x. Background We compared the efficacy of medical masks, N95 respirators (fit tested and non fit tested), in health care workers (HCWs). Methods A cluster randomized clinical trial (RCT) of 1441 HCWs in 15 Beijing hospitals was performed during the 2008/2009 winter. Participants wore masks or respirators during the entire work shift for 4 weeks. Outcomes included clinical respiratory illness (CRI), influenza‐like illness (ILI), laboratory‐confirmed respiratory virus infection and influenza. A convenience no‐mask/respirator group of 481 health workers from nine hospitals was compared. Findings The rates of CRI (3·9% versus 6·7%), ILI (0·3% versus 0·6%), laboratory‐confirmed respiratory virus (1·4% versus 2·6%) and influenza (0·3% versus 1%) infection were consistently lower for the N95 group compared to medical masks. By intention‐to‐treat analysis, when P values were adjusted for clustering, non‐fit‐tested N95 respirators were significantly more protective than medical masks against CRI, but no other outcomes were significant. The rates of all outcomes were higher in the convenience no‐mask group compared to the intervention arms. There was no significant difference in outcomes between the N95 arms with and without fit testing. Rates of fit test failure were low. In a post hoc analysis adjusted for potential confounders, N95 masks and hospital level were significant, but medical masks, vaccination, handwashing and high‐risk procedures were not. Interpretation Rates of infection in the medical mask group were double that in the N95 group. A benefit of respirators is suggested but would need to be confirmed by a larger trial, as this study may have been underpowered. The finding on fit testing is specific to the type of respirator used in the study and cannot be generalized to other respirators. Trial registration Australian New Zealand Clinical Trials Registry (ANZCTR), ACTRN: ACTRN12609000257268 (http://www.anzctr.org.au). PMID:21477136
LaZerte, Stefanie E.; Slabbekoorn, Hans; Otter, Ken A.
2016-01-01
Urban noise can interfere with avian communication through masking, but birds can reduce this interference by altering their vocalizations. Although several experimental studies indicate that birds can rapidly change their vocalizations in response to sudden increases in ambient noise, none have investigated whether this is a learned response that depends on previous exposure. Black-capped chickadees (Poecile atricapillus) change the frequency of their songs in response to both fluctuating traffic noise and experimental noise. We investigated whether these responses to fluctuating noise depend on familiarity with noise. We confirmed that males in noisy areas sang higher-frequency songs than those in quiet areas, but found that only males in already-noisy territories shifted songs upwards in immediate response to experimental noise. Unexpectedly, males in more quiet territories shifted songs downwards in response to experimental noise. These results suggest that chickadees may require prior experience with fluctuating noise to adjust vocalizations in such a way as to minimize masking. Thus, learning to cope may be an important part of adjusting to acoustic life in the city. PMID:27358372
LaZerte, Stefanie E; Slabbekoorn, Hans; Otter, Ken A
2016-06-29
Urban noise can interfere with avian communication through masking, but birds can reduce this interference by altering their vocalizations. Although several experimental studies indicate that birds can rapidly change their vocalizations in response to sudden increases in ambient noise, none have investigated whether this is a learned response that depends on previous exposure. Black-capped chickadees (Poecile atricapillus) change the frequency of their songs in response to both fluctuating traffic noise and experimental noise. We investigated whether these responses to fluctuating noise depend on familiarity with noise. We confirmed that males in noisy areas sang higher-frequency songs than those in quiet areas, but found that only males in already-noisy territories shifted songs upwards in immediate response to experimental noise. Unexpectedly, males in more quiet territories shifted songs downwards in response to experimental noise. These results suggest that chickadees may require prior experience with fluctuating noise to adjust vocalizations in such a way as to minimize masking. Thus, learning to cope may be an important part of adjusting to acoustic life in the city. © 2016 The Author(s).
NASA Technical Reports Server (NTRS)
King, Michael D.; Platnick, Steven; Wind, Galina; Arnold, George T.; Ackerman, Steven A.; Frey, Richard
2007-01-01
The MODIS Airborne Simulator (MAS) and MODIS/ASTER Airborne Simulator (MASTER) were used to obtain measurements of the bidirectional reflectance and brightness temperature of clouds at 50 discrete wavelengths between 0.47 and 14.3 (12.9 m for MASTER). These observations were obtained from the NASA ER-2 aircraft as part of the Tropical Composition, Clouds and Climate Coupling Experiment (TC4) conducted over Central America and surrounding Pacific and Atlantic Oceans between July 17 and August 8, 2007. Multispectral images in eight distinct bands were used to derive a confidence in clear sky (or alternatively the probability of cloud) over land and ocean ecosystems. Based on the results of individual tests run as part of this cloud mask, an algorithm was developed to estimate the phase of the clouds (liquid water, ice, or undetermined phase). Finally, the cloud optical thickness and effective radius were derived for both liquid water and ice clouds that were detected during each flight, using a nearly identical algorithm as that implemented operationally to process MODIS cloud data from the Aqua and Terra satellites (Collection 5). This analysis shows that the cloud mask developed for operational use on MODIS, and tested using MAS and MASTER date in TC4, is quite capable of distinguishing both liquid water and ice clouds during daytime conditions over both land and ocean. The cloud optical thickness and effective radius retrievals used three distinct bands of the MAS (or MASTER), and these results were compared with nearly simultaneous retrievals of MODIS on the Terra spacecraft. Finally, this MODIS-based algorithm was adapted to MISR data to infer the cloud optical thickness of liquid water clouds from MISR. Results of this analysis will be presented and discussed.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Halavanau, A.; Ha, G.
Intercepting multi-aperture masks (e.g. pepper pot or multislit mask) combined with a downstream transversedensity diagnostics (e.g. based on optical transition radiation or employing scintillating media) are commonly used for characterizing the phase space of charged particle beams and the associated emittances. The required data analysis relies on precise calculation of the RMS sizes and positions of the beamlets originated from the mask which drifted up to the analyzing diagnostics. Voronoi diagram is an efficient method for splitting a plane into subsets according to the distances between given vortices. The application of the method to analyze data from pepper pot andmore » multislit mask based measurement is validated via numerical simulation and applied to experimental data acquired at the Argonne Wakefield Accelerator (AWA) facility. We also discuss the application of the Voronoi diagrams to quantify transverselymodulated beams distortion.« less
NASA Astrophysics Data System (ADS)
Lyon, Richard F.
2011-11-01
A cascade of two-pole-two-zero filters with level-dependent pole and zero dampings, with few parameters, can provide a good match to human psychophysical and physiological data. The model has been fitted to data on detection threshold for tones in notched-noise masking, including bandwidth and filter shape changes over a wide range of levels, and has been shown to provide better fits with fewer parameters compared to other auditory filter models such as gammachirps. Originally motivated as an efficient machine implementation of auditory filtering related to the WKB analysis method of cochlear wave propagation, such filter cascades also provide good fits to mechanical basilar membrane data, and to auditory nerve data, including linear low-frequency tail response, level-dependent peak gain, sharp tuning curves, nonlinear compression curves, level-independent zero-crossing times in the impulse response, realistic instantaneous frequency glides, and appropriate level-dependent group delay even with minimum-phase response. As part of exploring different level-dependent parameterizations of such filter cascades, we have identified a simple sufficient condition for stable zero-crossing times, based on the shifting property of the Laplace transform: simply move all the s-domain poles and zeros by equal amounts in the real-s direction. Such pole-zero filter cascades are efficient front ends for machine hearing applications, such as music information retrieval, content identification, speech recognition, and sound indexing.
NASA Astrophysics Data System (ADS)
Shi, Fang; Cady, Eric; Seo, Byoung-Joon; An, Xin; Balasubramanian, Kunjithapatham; Kern, Brian; Lam, Raymond; Marx, David; Moody, Dwight; Mejia Prada, Camilo; Patterson, Keith; Poberezhskiy, Ilya; Shields, Joel; Sidick, Erkin; Tang, Hong; Trauger, John; Truong, Tuan; White, Victor; Wilson, Daniel; Zhou, Hanying
2017-09-01
To maintain the required performance of WFIRST Coronagraph in a realistic space environment, a Low Order Wavefront Sensing and Control (LOWFS/C) subsystem is necessary. The LOWFS/C uses a Zernike wavefront sensor (ZWFS) with the phase shifting disk combined with the starlight rejecting occulting mask. For wavefront error corrections, WFIRST LOWFS/C uses a fast steering mirror (FSM) for line-of-sight (LoS) correction, a focusing mirror for focus drift correction, and one of the two deformable mirrors (DM) for other low order wavefront error (WFE) correction. As a part of technology development and demonstration for WFIRST Coronagraph, a dedicated Occulting Mask Coronagraph (OMC) testbed has been built and commissioned. With its configuration similar to the WFIRST flight coronagraph instrument the OMC testbed consists of two coronagraph modes, Shaped Pupil Coronagraph (SPC) and Hybrid Lyot Coronagraph (HLC), a low order wavefront sensor (LOWFS), and an optical telescope assembly (OTA) simulator which can generate realistic LoS drift and jitter as well as low order wavefront error that would be induced by the WFIRST telescope's vibration and thermal changes. In this paper, we will introduce the concept of WFIRST LOWFS/C, describe the OMC testbed, and present the testbed results of LOWFS sensor performance. We will also present our recent results from the dynamic coronagraph tests in which we have demonstrated of using LOWFS/C to maintain the coronagraph contrast with the presence of WFIRST-like line-of-sight and low order wavefront disturbances.