Sample records for beam direct write

  1. Demonstration of lithography patterns using reflective e-beam direct write

    NASA Astrophysics Data System (ADS)

    Freed, Regina; Sun, Jeff; Brodie, Alan; Petric, Paul; McCord, Mark; Ronse, Kurt; Haspeslagh, Luc; Vereecke, Bart

    2011-04-01

    Traditionally, e-beam direct write lithography has been too slow for most lithography applications. E-beam direct write lithography has been used for mask writing rather than wafer processing since the maximum blur requirements limit column beam current - which drives e-beam throughput. To print small features and a fine pitch with an e-beam tool requires a sacrifice in processing time unless one significantly increases the total number of beams on a single writing tool. Because of the uncertainty with regards to the optical lithography roadmap beyond the 22 nm technology node, the semiconductor equipment industry is in the process of designing and testing e-beam lithography tools with the potential for high volume wafer processing. For this work, we report on the development and current status of a new maskless, direct write e-beam lithography tool which has the potential for high volume lithography at and below the 22 nm technology node. A Reflective Electron Beam Lithography (REBL) tool is being developed for high throughput electron beam direct write maskless lithography. The system is targeting critical patterning steps at the 22 nm node and beyond at a capital cost equivalent to conventional lithography. Reflective Electron Beam Lithography incorporates a number of novel technologies to generate and expose lithographic patterns with a throughput and footprint comparable to current 193 nm immersion lithography systems. A patented, reflective electron optic or Digital Pattern Generator (DPG) enables the unique approach. The Digital Pattern Generator is a CMOS ASIC chip with an array of small, independently controllable lens elements (lenslets), which act as an array of electron mirrors. In this way, the REBL system is capable of generating the pattern to be written using massively parallel exposure by ~1 million beams at extremely high data rates (~ 1Tbps). A rotary stage concept using a rotating platen carrying multiple wafers optimizes the writing strategy of the DPG to achieve the capability of high throughput for sparse pattern wafer levels. The lens elements on the DPG are fabricated at IMEC (Leuven, Belgium) under IMEC's CMORE program. The CMOS fabricated DPG contains ~ 1,000,000 lens elements, allowing for 1,000,000 individually controllable beamlets. A single lens element consists of 5 electrodes, each of which can be set at controlled voltage levels to either absorb or reflect the electron beam. A system using a linear movable stage and the DPG integrated into the electron optics module was used to expose patterns on device representative wafers. Results of these exposure tests are discussed.

  2. High-throughput NGL electron-beam direct-write lithography system

    NASA Astrophysics Data System (ADS)

    Parker, N. William; Brodie, Alan D.; McCoy, John H.

    2000-07-01

    Electron beam lithography systems have historically had low throughput. The only practical solution to this limitation is an approach using many beams writing simultaneously. For single-column multi-beam systems, including projection optics (SCALPELR and PREVAIL) and blanked aperture arrays, throughput and resolution are limited by space-charge effects. Multibeam micro-column (one beam per column) systems are limited by the need for low voltage operation, electrical connection density and fabrication complexities. In this paper, we discuss a new multi-beam concept employing multiple columns each with multiple beams to generate a very large total number of parallel writing beams. This overcomes the limitations of space-charge interactions and low voltage operation. We also discuss a rationale leading to the optimum number of columns and beams per column. Using this approach we show how production throughputs >= 60 wafers per hour can be achieved at CDs

  3. Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography

    NASA Astrophysics Data System (ADS)

    Bat, Erhan; Lee, Juneyoung; Lau, Uland Y.; Maynard, Heather D.

    2015-03-01

    Direct-write patterning of multiple proteins on surfaces is of tremendous interest for a myriad of applications. Precise arrangement of different proteins at increasingly smaller dimensions is a fundamental challenge to apply the materials in tissue engineering, diagnostics, proteomics and biosensors. Herein, we present a new resist that protects proteins during electron-beam exposure and its application in direct-write patterning of multiple proteins. Polymers with pendant trehalose units are shown to effectively crosslink to surfaces as negative resists, while at the same time providing stabilization to proteins during the vacuum and electron-beam irradiation steps. In this manner, arbitrary patterns of several different classes of proteins such as enzymes, growth factors and immunoglobulins are realized. Utilizing the high-precision alignment capability of electron-beam lithography, surfaces with complex patterns of multiple proteins are successfully generated at the micrometre and nanometre scale without requiring cleanroom conditions.

  4. Design of titania nanotube structures by focused laser beam direct writing

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Enachi, Mihai; Stevens-Kalceff, Marion A.; Sarua, Andrei

    In this work, we report on electrochemical fabrication of titania films consisting of nanotubes (NTs) and their treatment by focused laser beam. The results of sample characterization by optical and scanning electron microscopy, cathodoluminescence imaging, and Raman scattering scanning spectroscopy are compared to those inherent to specimens subjected to thermal treatment in a furnace. The obtained data demonstrate possibilities for controlling crystallographic structure of TiO{sub 2} NTs by focused laser beam direct writing. These findings open new prospects for the design and fabrication of spatial architectures based on titania nanotubes.

  5. In situ mitigation of subsurface and peripheral focused ion beam damage via simultaneous pulsed laser heating

    DOE PAGES

    Stanford, Michael G.; Lewis, Brett B.; Iberi, Vighter O.; ...

    2016-02-16

    Focused helium and neon ion (He(+)/Ne(+) ) beam processing has recently been used to push resolution limits of direct-write nanoscale synthesis. The ubiquitous insertion of focused He(+) /Ne(+) beams as the next-generation nanofabrication tool-of-choice is currently limited by deleterious subsurface and peripheral damage induced by the energetic ions in the underlying substrate. The in situ mitigation of subsurface damage induced by He(+)/Ne(+) ion exposures in silicon via a synchronized infrared pulsed laser-assisted process is demonstrated. The pulsed laser assist provides highly localized in situ photothermal energy which reduces the implantation and defect concentration by greater than 90%. The laser-assisted exposuremore » process is also shown to reduce peripheral defects in He(+) patterned graphene, which makes this process an attractive candidate for direct-write patterning of 2D materials. In conclusion, these results offer a necessary solution for the applicability of high-resolution direct-write nanoscale material processing via focused ion beams.« less

  6. Direct nanopatterning of polymer/silver nanoblocks under low energy electron beam irradiation.

    PubMed

    El Mel, Abdel-Aziz; Stephant, Nicolas; Gautier, Romain

    2016-10-06

    In this communication, we report on the growth, direct writing and nanopatterning of polymer/silver nanoblocks under low energy electron beam irradiation using a scanning electron microscope. The nanoblocks are produced by placing a droplet of an ethylene glycol solution containing silver nitrate and polyvinylpyrrolidone diluted in ethanol directly on a hot substrate heated up to 150 °C. Upon complete evaporation of the droplet, nanospheres, nano- and micro-triangles and nanoblocks made of silver-containing polymers, form over the substrate surface. Considering the nanoblocks as a model system, we demonstrate that such nanostructures are extremely sensitive to the e-beam extracted from the source of a scanning electron microscope operating at low acceleration voltages (between 5 and 7 kV). This sensitivity allows us to efficiently create various nanopatterns (e.g. arrays of holes, oblique slits and nanotrenches) in the material under e-beam irradiation. In addition to the possibility of writing, the nanoblocks revealed a self-healing ability allowing them to recover a relatively smooth surface after etching. Thanks to these properties, such nanomaterials can be used as a support for data writing and erasing on the nanoscale under low energy electron beam irradiation.

  7. Diffractive optics fabricated by direct write methods with an electron beam

    NASA Technical Reports Server (NTRS)

    Kress, Bernard; Zaleta, David; Daschner, Walter; Urquhart, Kris; Stein, Robert; Lee, Sing H.

    1993-01-01

    State-of-the-art diffractive optics are fabricated using e-beam lithography and dry etching techniques to achieve multilevel phase elements with very high diffraction efficiencies. One of the major challenges encountered in fabricating diffractive optics is the small feature size (e.g. for diffractive lenses with small f-number). It is not only the e-beam system which dictates the feature size limitations, but also the alignment systems (mask aligner) and the materials (e-beam and photo resists). In order to allow diffractive optics to be used in new optoelectronic systems, it is necessary not only to fabricate elements with small feature sizes but also to do so in an economical fashion. Since price of a multilevel diffractive optical element is closely related to the e-beam writing time and the number of etching steps, we need to decrease the writing time and etching steps without affecting the quality of the element. To do this one has to utilize the full potentials of the e-beam writing system. In this paper, we will present three diffractive optics fabrication techniques which will reduce the number of process steps, the writing time, and the overall fabrication time for multilevel phase diffractive optics.

  8. Three-dimensional integration of microoptical components buried inside photosensitive glass by femtosecond laser direct writing

    NASA Astrophysics Data System (ADS)

    Wang, Zhongke; Sugioka, Koji; Midorikawa, Katsumi

    2007-12-01

    We report the three-dimensional (3D) integration of microoptical components such as microlenses, micromirrors and optical waveguides in a single glass chip by femtosecond (fs) laser direct writing. First, two types of microoptical lenses were fabricated inside photosensitive Foturan glass by forming hollow microstructures using fs laser direct writing followed by thermal treatment, successive wet etching and additional annealing. One type of lens is the cylindrical microlens with a curvature radius R of 1.0 mm, and the other is the plano-convex microlens with radius R of 0.75 mm. Subsequently, by the continuous procedure of hollow microstructure fabrication, a micromirror was integrated with the plano-convex microlens in the single glass chip. Further integration of waveguides was performed by internal refractive index modification using fs laser direct writing after the hollow structure fabrication of the microlens and the micromirror. A demonstration of the laser beam transmission in the integrated optical microdevice shows that the 3D integration of waveguides with a micromirror and a microoptical lens in a single glass chip is highly effective for light beam guiding and focusing.

  9. Progress and process improvements for multiple electron-beam direct write

    NASA Astrophysics Data System (ADS)

    Servin, Isabelle; Pourteau, Marie-Line; Pradelles, Jonathan; Essomba, Philippe; Lattard, Ludovic; Brandt, Pieter; Wieland, Marco

    2017-06-01

    Massively parallel electron beam direct write (MP-EBDW) lithography is a cost-effective patterning solution, complementary to optical lithography, for a variety of applications ranging from 200 to 14 nm. This paper will present last process/integration results to achieve targets for both 28 and 45 nm nodes. For 28 nm node, we mainly focus on line-width roughness (LWR) mitigation by playing with stack, new resist platform and bias design strategy. The lines roughness was reduced by using thicker spin-on-carbon (SOC) hardmask (-14%) or non-chemically amplified (non-CAR) resist with bias writing strategy implementation (-20%). Etch transfer into trilayer has been demonstrated by preserving pattern fidelity and profiles for both CAR and non-CAR resists. For 45 nm node, we demonstrate the electron-beam process integration within optical CMOS flows. Resists based on KrF platform show a full compatibility with multiple stacks to fit with conventional optical flow used for critical layers. Electron-beam resist performances have been optimized to fit the specifications in terms of resolution, energy latitude, LWR and stack compatibility. The patterning process overview showing the latest achievements is mature enough to enable starting the multi-beam technology pre-production mode.

  10. Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment

    PubMed Central

    Belić, Domagoj; Shawrav, Mostafa M; Bertagnolli, Emmerich

    2017-01-01

    This work presents a highly effective approach for the chemical purification of directly written 2D and 3D gold nanostructures suitable for plasmonics, biomolecule immobilisation, and nanoelectronics. Gold nano- and microstructures can be fabricated by one-step direct-write lithography process using focused electron beam induced deposition (FEBID). Typically, as-deposited gold nanostructures suffer from a low Au content and unacceptably high carbon contamination. We show that the undesirable carbon contamination can be diminished using a two-step process – a combination of optimized deposition followed by appropriate postdeposition cleaning. Starting from the common metal-organic precursor Me2-Au-tfac, it is demonstrated that the Au content in pristine FEBID nanostructures can be increased from 30 atom % to as much as 72 atom %, depending on the sustained electron beam dose. As a second step, oxygen-plasma treatment is established to further enhance the Au content in the structures, while preserving their morphology to a high degree. This two-step process represents a simple, feasible and high-throughput method for direct writing of purer gold nanostructures that can enable their future use for demanding applications. PMID:29259868

  11. Integration of e-beam direct write in BEOL processes of 28nm SRAM technology node using mix and match

    NASA Astrophysics Data System (ADS)

    Gutsch, Manuela; Choi, Kang-Hoon; Hanisch, Norbert; Hohle, Christoph; Seidel, Robert; Steidel, Katja; Thrun, Xaver; Werner, Thomas

    2014-10-01

    Many efforts were spent in the development of EUV technologies, but from a customer point of view EUV is still behind expectations. In parallel since years maskless lithography is included in the ITRS roadmap wherein multi electron beam direct patterning is considered as an alternative or complementary approach for patterning of advanced technology nodes. The process of multi beam exposures can be emulated by single beam technologies available in the field. While variable shape-beam direct writers are already used for niche applications, the integration capability of e-beam direct write at advanced nodes has not been proven, yet. In this study the e-beam lithography was implemented in the BEoL processes of the 28nm SRAM technology. Integrated 300mm wafers with a 28nm back-end of line (BEoL) stack from GLOBALFOUNDRIES, Dresden, were used for the experiments. For the patterning of the Metal layer a Mix and Match concept based on the sequence litho - etch - litho - etch (LELE) was developed and evaluated wherein several exposure fields were blanked out during the optical exposure. E-beam patterning results of BEoL Metal and Via layers are presented using a 50kV VISTEC SB3050DW variable shaped electron beam direct writer at Fraunhofer IPMS-CNT. Etch results are shown and compared to the POR. In summary we demonstrate the integration capability of EBDW into a productive CMOS process flow at the example of the 28nm SRAM technology node.

  12. Effects on electron scattering and resist characteristics using assisting underlayers for e-beam direct write lithography

    NASA Astrophysics Data System (ADS)

    Thrun, Xaver; Choi, Kang-Hoon; Hanisch, Norbert; Hohle, Christoph; Steidel, Katja; Guerrero, Douglas; Figueiro, Thiago; Bartha, Johann W.

    2013-03-01

    Resist processing for future technology nodes becomes more and more complex. The resist film thickness is getting thinner and hardmask concepts (trilayer) are needed for reproducible etch transfer into the stack. Additional layers between resist and substrate are influencing the electron scattering in e-beam lithography and may also improve sensitivity and resolution. In this study, bare silicon wafers with different assisting underlayers were processed in a 300 mm CMOS manufacturing environment and were exposed on a 50 keV VISTEC SB3050DW variable-shaped electron beam direct writer at Fraunhofer CNT. The underlayers are organic-inorganic hybrid coatings with different metal additives. The negative-tone resist was evaluated in terms of contrast, sensitivity, resolution and LWR/LER as a function of the stack. The interactions between resist and different assisting underlayers on e-beam direct writing will be investigated. These layers could be used to optimize the trade-off among resolution, LWR and sensitivity in future applications.

  13. λ/26 silver nanodots fabricated by direct laser writing through highly sensitive two-photon photoreduction

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Cao, Yaoyu; Gu, Min, E-mail: mgu@swin.edu.au

    We demonstrated an approach to break the diffraction limit and realise deep-subwavelength two-photon direct laser writing by employing a highly sensitive photoreduction process. The photoreduction photosensitivity increased by at least 4 times while the wavelength of the fabrication laser beam was tuned from 800 nm to 580 nm. The increase of the photosensitivity resulted in improved resolution for the silver dot fabrication. By developing the photoreduction material with adding electron donors, the photosensitivity further increased and enabled the realisation of a single silver dot at 22 nm which is λ/26 for the wavelength of the fabrication laser beam.

  14. The Conductive Silver Nanowires Fabricated by Two-beam Laser Direct Writing on the Flexible Sheet.

    PubMed

    He, Gui-Cang; Zheng, Mei-Ling; Dong, Xian-Zi; Jin, Feng; Liu, Jie; Duan, Xuan-Ming; Zhao, Zhen-Sheng

    2017-02-02

    Flexible electrically conductive nanowires are now a key component in the fields of flexible devices. The achievement of metal nanowire with good flexibility, conductivity, compact and smooth morphology is recognized as one critical milestone for the flexible devices. In this study, a two-beam laser direct writing system is designed to fabricate AgNW on PET sheet. The minimum width of the AgNW fabricated by this method is 187 ± 34 nm with the height of 84 ± 4 nm. We have investigated the electrical resistance under different voltages and the applicable voltage per meter range is determined to be less than 7.5 × 10 3  V/m for the fabricated AgNW. The flexibility of the AgNW is very excellent, since the resistance only increases 6.63% even after the stretched bending of 2000 times at such a small bending radius of 1.0 mm. The proposed two-beam laser direct writing is an efficient method to fabricate AgNW on the flexible sheet, which could be applied in flexible micro/nano devices.

  15. In situ manufacture of magnetic tunnel junctions by a direct-write process

    NASA Astrophysics Data System (ADS)

    Costanzi, Barry N.; Riazanova, Anastasia V.; Dan Dahlberg, E.; Belova, Lyubov M.

    2014-06-01

    In situ construction of Co/SiO2/Co magnetic tunnel junctions using direct-write electron-beam-induced deposition is described. Proof-of-concept devices were built layer by layer depositing the specific components one at a time, allowing device manufacture using a strictly additive process. The devices exhibit a magnetic tunneling signature which agrees qualitatively with the Slonczewski model of magnetic tunneling.

  16. Highly conductive and pure gold nanostructures grown by electron beam induced deposition

    PubMed Central

    Shawrav, Mostafa M.; Taus, Philipp; Wanzenboeck, Heinz D.; Schinnerl, M.; Stöger-Pollach, M.; Schwarz, S.; Steiger-Thirsfeld, A.; Bertagnolli, Emmerich

    2016-01-01

    This work introduces an additive direct-write nanofabrication technique for producing extremely conductive gold nanostructures from a commercial metalorganic precursor. Gold content of 91 atomic % (at. %) was achieved by using water as an oxidative enhancer during direct-write deposition. A model was developed based on the deposition rate and the chemical composition, and it explains the surface processes that lead to the increases in gold purity and deposition yield. Co-injection of an oxidative enhancer enabled Focused Electron Beam Induced Deposition (FEBID)—a maskless, resistless deposition method for three dimensional (3D) nanostructures—to directly yield pure gold in a single process step, without post-deposition purification. Gold nanowires displayed resistivity down to 8.8 μΩ cm. This is the highest conductivity achieved so far from FEBID and it opens the possibility of applications in nanoelectronics, such as direct-write contacts to nanomaterials. The increased gold deposition yield and the ultralow carbon level will facilitate future applications such as the fabrication of 3D nanostructures in nanoplasmonics and biomolecule immobilization. PMID:27666531

  17. High performance Si immersion gratings patterned with electron beam lithography

    NASA Astrophysics Data System (ADS)

    Gully-Santiago, Michael A.; Jaffe, Daniel T.; Brooks, Cynthia B.; Wilson, Daniel W.; Muller, Richard E.

    2014-07-01

    Infrared spectrographs employing silicon immersion gratings can be significantly more compact than spectro- graphs using front-surface gratings. The Si gratings can also offer continuous wavelength coverage at high spectral resolution. The grooves in Si gratings are made with semiconductor lithography techniques, to date almost entirely using contact mask photolithography. Planned near-infrared astronomical spectrographs require either finer groove pitches or higher positional accuracy than standard UV contact mask photolithography can reach. A collaboration between the University of Texas at Austin Silicon Diffractive Optics Group and the Jet Propulsion Laboratory Microdevices Laboratory has experimented with direct writing silicon immersion grating grooves with electron beam lithography. The patterning process involves depositing positive e-beam resist on 1 to 30 mm thick, 100 mm diameter monolithic crystalline silicon substrates. We then use the facility JEOL 9300FS e-beam writer at JPL to produce the linear pattern that defines the gratings. There are three key challenges to produce high-performance e-beam written silicon immersion gratings. (1) E- beam field and subfield stitching boundaries cause periodic cross-hatch structures along the grating grooves. The structures manifest themselves as spectral and spatial dimension ghosts in the diffraction limited point spread function (PSF) of the diffraction grating. In this paper, we show that the effects of e-beam field boundaries must be mitigated. We have significantly reduced ghost power with only minor increases in write time by using four or more field sizes of less than 500 μm. (2) The finite e-beam stage drift and run-out error cause large-scale structure in the wavefront error. We deal with this problem by applying a mark detection loop to check for and correct out minuscule stage drifts. We measure the level and direction of stage drift and show that mark detection reduces peak-to-valley wavefront error by a factor of 5. (3) The serial write process for typical gratings yields write times of about 24 hours- this makes prototyping costly. We discuss work with negative e-beam resist to reduce the fill factor of exposure, and therefore limit the exposure time. We also discuss the tradeoffs of long write-time serial write processes like e-beam with UV photomask lithography. We show the results of experiments on small pattern size prototypes on silicon wafers. Current prototypes now exceed 30 dB of suppression on spectral and spatial dimension ghosts compared to monochromatic spectral purity measurements of the backside of Si echelle gratings in reflection at 632 nm. We perform interferometry at 632 nm in reflection with a 25 mm circular beam on a grating with a blaze angle of 71.6°. The measured wavefront error is 0.09 waves peak to valley.

  18. Nanoscale Engineering in VO2 Nanowires via Direct Electron Writing Process.

    PubMed

    Zhang, Zhenhua; Guo, Hua; Ding, Wenqiang; Zhang, Bin; Lu, Yue; Ke, Xiaoxing; Liu, Weiwei; Chen, Furong; Sui, Manling

    2017-02-08

    Controlling phase transition in functional materials at nanoscale is not only of broad scientific interest but also important for practical applications in the fields of renewable energy, information storage, transducer, sensor, and so forth. As a model functional material, vanadium dioxide (VO 2 ) has its metal-insulator transition (MIT) usually at a sharp temperature around 68 °C. Here, we report a focused electron beam can directly lower down the transition temperature of a nanoarea to room temperature without prepatterning the VO 2 . This novel process is called radiolysis-assisted MIT (R-MIT). The electron beam irradiation fabricates a unique gradual MIT zone to several times of the beam size in which the temperature-dependent phase transition is achieved in an extended temperature range. The gradual transformation zone offers to precisely control the ratio of metal/insulator phases. This direct electron writing technique can open up an opportunity to precisely engineer nanodomains of diversified electronic properties in functional material-based devices.

  19. Model of diffusion-assisted direct laser writing by means of nanopolymerization in the presence of radical quencher

    NASA Astrophysics Data System (ADS)

    Pikulin, Alexander; Bityurin, Nikita; Sokolov, Viktor I.

    2015-12-01

    Diffusion-assisted direct laser writing (DA-DLW) by multiphoton polymerization has been recently shown to be one of the most promising methods for the high-resolution 3D nanofabrication [I. Sakellari, et al., ACS Nano 6, 2302 (2012)]. The improvement of the writing spatial resolution has been observed under certain conditions when the mobile radical quencher (polymerization inhibitor) is added to the photosensitive composition. In this work, we present a theoretical study of this method, focusing on the resolution capabilities and optimal writing parameters. The laser beam absorption in the polymerizable composition causes the localized depletion of the quencher molecules. If the quencher depletion is balanced by its diffusion from the outside of the focal volume, the quasi-stationary non-equillibrium concentration spatial profile with zero minimum can be obtained. The polymer is then effectively formed only in the domain where the quencher is depleted. The spatially-distributed quencher, in this case, has the effect similar to that of the vortex beam in STimulated Emission Microscopy (STED).

  20. Model of diffusion-assisted direct laser writing by means of nanopolymerization in the presence of radical quencher

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Pikulin, Alexander, E-mail: pikulin@ufp.appl.sci-nnov.ru; Bityurin, Nikita; Institute of Applied Physics of Russian Academy of Sciences, 46, Ul’yanov Str., Nizhniy Novgorod, 603950

    Diffusion-assisted direct laser writing (DA-DLW) by multiphoton polymerization has been recently shown to be one of the most promising methods for the high-resolution 3D nanofabrication [I. Sakellari, et al., ACS Nano 6, 2302 (2012)]. The improvement of the writing spatial resolution has been observed under certain conditions when the mobile radical quencher (polymerization inhibitor) is added to the photosensitive composition. In this work, we present a theoretical study of this method, focusing on the resolution capabilities and optimal writing parameters. The laser beam absorption in the polymerizable composition causes the localized depletion of the quencher molecules. If the quencher depletionmore » is balanced by its diffusion from the outside of the focal volume, the quasi-stationary non-equillibrium concentration spatial profile with zero minimum can be obtained. The polymer is then effectively formed only in the domain where the quencher is depleted. The spatially-distributed quencher, in this case, has the effect similar to that of the vortex beam in STimulated Emission Microscopy (STED)« less

  1. Self-organized micro-holes on titania based sol-gel films under continuous direct writing with a continuous wave ultraviolet laser

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Bakhti, S.; Destouches, N.; Gamet, E.

    The microstructuring of titania based sol-gel films is investigated by direct writing with a continuous wave ultraviolet laser beam emitting at 244 nm. Depending on the exposure conditions, the films exhibit a volume expansion, a volume shrinkage, a self-shaped delamination, or are damaged. This paper is mainly focused on the regime where spontaneous local delamination occurs, which corresponds to a narrow range of laser irradiances and writing speeds. In this regime, self-organized round-shape micro-holes opened on the substrate are generated.

  2. Real-time edge-enhanced optical correlator

    NASA Technical Reports Server (NTRS)

    Liu, Tsuen-Hsi (Inventor); Cheng, Li-Jen (Inventor)

    1992-01-01

    Edge enhancement of an input image by four-wave mixing a first write beam with a second write beam in a photorefractive crystal, GaAs, was achieved for VanderLugt optical correlation with an edge enhanced reference image by optimizing the power ratio of a second write beam to the first write beam (70:1) and optimizing the power ratio of a read beam, which carries the reference image to the first write beam (100:701). Liquid crystal TV panels are employed as spatial light modulators to change the input and reference images in real time.

  3. Fabrication of computer-generated holograms using femtosecond laser direct writing.

    PubMed

    Berlich, René; Richter, Daniel; Richardson, Martin; Nolte, Stefan

    2016-04-15

    We demonstrate a single-step fabrication method for computer-generated holograms based on femtosecond laser direct writing. Therefore, a tightly arranged longitudinal waveguide array is directly inscribed into a transparent material. By tailoring the individual waveguide length, the phase profile of an incident laser beam can be arbitrarily adapted. The approach is verified in common borosilicate glass by inscribing a designed phase hologram, which forms the desired intensity pattern in its far field. The resulting performance is analyzed, and the potential as well as limitations of the method are discussed.

  4. Direct write electron beam lithography: a historical overview

    NASA Astrophysics Data System (ADS)

    Pfeiffer, Hans C.

    2010-09-01

    Maskless pattern generation capability in combination with practically limitless resolution made probe-forming electron beam systems attractive tools in the semiconductor fabrication process. However, serial exposure of pattern elements with a scanning beam is a slow process and throughput presented a key challenge in electron beam lithography from the beginning. To meet this challenge imaging concepts with increasing exposure efficiency have been developed projecting ever larger number of pixels in parallel. This evolution started in the 1960s with the SEM-type Gaussian beam systems writing one pixel at a time directly on wafers. During the 1970s IBM pioneered the concept of shaped beams containing multiple pixels which led to higher throughput and an early success of e-beam direct write (EBDW) in large scale manufacturing of semiconductor chips. EBDW in a mix-and match approach with optical lithography provided unique flexibility in part number management and cycle time reduction and proved extremely cost effective in IBM's Quick-Turn-Around-Time (QTAT) facilities. But shaped beams did not keep pace with Moore's law because of limitations imposed by the physics of charged particles: Coulomb interactions between beam electrons cause image blur and consequently limit beam current and throughput. A new technology approach was needed. Physically separating beam electrons into multiple beamlets to reduce Coulomb interaction led to the development of massively parallel projection of pixels. Electron projection lithography (EPL) - a mask based imaging technique emulating optical steppers - was pursued during the 1990s by Bell Labs with SCALPEL and by IBM with PREVAIL in partnership with Nikon. In 2003 Nikon shipped the first NCR-EB1A e-beam stepper based on the PREVAIL technology to Selete. It exposed pattern segments containing 10 million pixels in single shot and represented the first successful demonstration of massively parallel pixel projection. However the window of opportunity for EPL had closed with the quick implementation of immersion lithography and the interest of the industry has since shifted back to maskless lithography (ML2). This historical overview of EBDW will highlight opportunities and limitation of the technology with particular focus on technical challenges facing the current ML2 development efforts in Europe and the US. A brief status report and risk assessment of the ML2 approaches will be provided.

  5. Beam shaping of laser diode radiation by waveguides with arbitrary cladding geometry written with fs-laser radiation.

    PubMed

    Beckmann, Dennis; Schnitzler, Daniel; Schaefer, Dagmar; Gottmann, Jens; Kelbassa, Ingomar

    2011-12-05

    Waveguides with arbitrary cross sections are written in the volume of Al(2)O(3)-crystals using tightly focused femtosecond laser radiation. Utilizing a scanning system with large numerical aperture, complex cladding geometries are realized with a precision around 0.5 µm and a scanning speed up to 100 mm/s. Individual beam and mode shaping of laser diode radiation is demonstrated by varying the design of the waveguide cladding. The influence of the writing parameters on the waveguide properties are investigated resulting in a numerical aperture of the waveguides in the range of 0.1. This direct laser writing technique enables optical devices which could possibly replace bulky beam shaping setups with an integrated solution.

  6. Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces.

    PubMed

    Gurbán, S; Petrik, P; Serényi, M; Sulyok, A; Menyhárd, M; Baradács, E; Parditka, B; Cserháti, C; Langer, G A; Erdélyi, Z

    2018-02-01

    Al 2 O 3 (5 nm)/Si (bulk) sample was subjected to irradiation of 5 keV electrons at room temperature, in a vacuum chamber (pressure 1 × 10 -9 mbar) and formation of amorphous SiO 2 around the interface was observed. The oxygen for the silicon dioxide growth was provided by the electron bombardment induced bond breaking in Al 2 O 3 and the subsequent production of neutral and/or charged oxygen. The amorphous SiO 2 rich layer has grown into the Al 2 O 3 layer showing that oxygen as well as silicon transport occurred during irradiation at room temperature. We propose that both transports are mediated by local electric field and charged and/or uncharged defects created by the electron irradiation. The direct modification of metal oxide/silicon interface by electron-beam irradiation is a promising method of accomplishing direct write electron-beam lithography at buried interfaces.

  7. Geometrical E-beam proximity correction for raster scan systems

    NASA Astrophysics Data System (ADS)

    Belic, Nikola; Eisenmann, Hans; Hartmann, Hans; Waas, Thomas

    1999-04-01

    High pattern fidelity is a basic requirement for the generation of masks containing sub micro structures and for direct writing. Increasing needs mainly emerging from OPC at mask level and x-ray lithography require a correction of the e-beam proximity effect. The most part of e-beam writers are raster scan system. This paper describes a new method for geometrical pattern correction in order to provide a correction solution for e-beam system that are not able to apply variable doses.

  8. Femtosecond laser fabrication of birefringent directional couplers as polarization beam splitters in fused silica.

    PubMed

    Fernandes, Luís A; Grenier, Jason R; Herman, Peter R; Aitchison, J Stewart; Marques, Paulo V S

    2011-06-20

    Integrated polarization beam splitters based on birefringent directional couplers are demonstrated. The devices are fabricated in bulk fused silica glass by femtosecond laser writing (300 fs, 150 nJ at 500 kHz, 522 nm). The birefringence was measured from the spectral splitting of the Bragg grating resonances associated with the vertically and horizontally polarized modes. Polarization splitting directional couplers were designed and demonstrated with 0.5 dB/cm propagation losses and -19 dB and -24 dB extinction ratios for the polarization splitting.

  9. Three-dimensional direct cell patterning in collagen hydrogels with near-infrared femtosecond laser

    PubMed Central

    Hribar, Kolin C.; Meggs, Kyle; Liu, Justin; Zhu, Wei; Qu, Xin; Chen, Shaochen

    2015-01-01

    We report a methodology for three-dimensional (3D) cell patterning in a hydrogel in situ. Gold nanorods within a cell-encapsulating collagen hydrogel absorb a focused near-infrared femtosecond laser beam, locally denaturing the collagen and forming channels, into which cells migrate, proliferate, and align in 3D. Importantly, pattern resolution is tunable based on writing speed and laser power, and high cell viability (>90%) is achieved using higher writing speeds and lower laser intensities. Overall, this patterning technique presents a flexible direct-write method that is applicable in tissue engineering systems where 3D alignment is critical (such as vascular, neural, cardiac, and muscle tissue). PMID:26603915

  10. Mapper: high throughput maskless lithography

    NASA Astrophysics Data System (ADS)

    Kuiper, V.; Kampherbeek, B. J.; Wieland, M. J.; de Boer, G.; ten Berge, G. F.; Boers, J.; Jager, R.; van de Peut, T.; Peijster, J. J. M.; Slot, E.; Steenbrink, S. W. H. K.; Teepen, T. F.; van Veen, A. H. V.

    2009-01-01

    Maskless electron beam lithography, or electron beam direct write, has been around for a long time in the semiconductor industry and was pioneered from the mid-1960s onwards. This technique has been used for mask writing applications as well as device engineering and in some cases chip manufacturing. However because of its relatively low throughput compared to optical lithography, electron beam lithography has never been the mainstream lithography technology. To extend optical lithography double patterning, as a bridging technology, and EUV lithography are currently explored. Irrespective of the technical viability of both approaches, one thing seems clear. They will be expensive [1]. MAPPER Lithography is developing a maskless lithography technology based on massively-parallel electron-beam writing with high speed optical data transport for switching the electron beams. In this way optical columns can be made with a throughput of 10-20 wafers per hour. By clustering several of these columns together high throughputs can be realized in a small footprint. This enables a highly cost-competitive alternative to double patterning and EUV alternatives. In 2007 MAPPER obtained its Proof of Lithography milestone by exposing in its Demonstrator 45 nm half pitch structures with 110 electron beams in parallel, where all the beams where individually switched on and off [2]. In 2008 MAPPER has taken a next step in its development by building several tools. A new platform has been designed and built which contains a 300 mm wafer stage, a wafer handler and an electron beam column with 110 parallel electron beams. This manuscript describes the first patterning results with this 300 mm platform.

  11. Adaptive slit beam shaping for direct laser written waveguides.

    PubMed

    Salter, P S; Jesacher, A; Spring, J B; Metcalf, B J; Thomas-Peter, N; Simmonds, R D; Langford, N K; Walmsley, I A; Booth, M J

    2012-02-15

    We demonstrate an improved method for fabricating optical waveguides in bulk materials by means of femtosecond laser writing. We use an LC spatial light modulator (SLM) to shape the beam focus by generating adaptive slit illumination in the pupil of the objective lens. A diffraction grating is applied in a strip across the SLM to simulate a slit, with the first diffracted order mapped onto the pupil plane of the objective lens while the zeroth order is blocked. This technique enables real-time control of the beam-shaping parameters during writing, facilitating the fabrication of more complicated structures than is possible using nonadaptive methods. Waveguides are demonstrated in fused silica with a coupling loss to single-mode fibers in the range of 0.2 to 0.5 dB and propagation loss <0.4 dB/cm.

  12. Elegant Gaussian beams for enhanced optical manipulation

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Alpmann, Christina, E-mail: c.alpmann@uni-muenster.de; Schöler, Christoph; Denz, Cornelia

    2015-06-15

    Generation of micro- and nanostructured complex light beams attains increasing impact in photonics and laser applications. In this contribution, we demonstrate the implementation and experimental realization of the relatively unknown, but highly versatile class of complex-valued Elegant Hermite- and Laguerre-Gaussian beams. These beams create higher trapping forces compared to standard Gaussian light fields due to their propagation changing properties. We demonstrate optical trapping and alignment of complex functional particles as nanocontainers with standard and Elegant Gaussian light beams. Elegant Gaussian beams will inspire manifold applications in optical manipulation, direct laser writing, or microscopy, where the design of the point-spread functionmore » is relevant.« less

  13. Single beam write and/or replay of spatial heterodyne holograms

    DOEpatents

    Thomas, Clarence E.; Hanson, Gregory R.

    2007-11-20

    A method of writing a spatially heterodyne hologram having spatially heterodyne fringes includes: passing a single write beam through a spatial light modulator that digitally modulates said single write beam; and focusing the single write beam at a focal plane of a lens to impose a holographic diffraction grating pattern on the photorefractive crystal, the holographic diffraction grating pattern including the spatially heterodyne hologram having spatially heterodyne fringes, wherein only said single write beam is incident on said photorefractive crystal without a reference beam. A method of replaying a spatially heterodyne hologram having spatially heterodyne fringes at a replay angle includes: illuminating a photorefractive crystal having a holographic diffraction grating with a beam from a laser at an illumination angle, the holographic diffraction grating pattern including the spatially heterodyne hologram having spatially heterodyne fringes, wherein a difference between said illumination angle and said replay angle defines a diffraction angle .alpha. that is a function of a plane wave mathematically added to original object wave phase and amplitude data of said spatially heterodyne hologram having spatially heterodyne fringes.

  14. Electron nanoprobe induced oxidation: A simulation of direct-write purification

    DOE PAGES

    Fowlkes, J. D.; Geier, B.; Lewis, B. B.; ...

    2015-06-01

    Electron beam direct-write has recently taken a large step forward with the advent of methods to purify deposits. This development has opened the door for future direct-write device prototyping and editing. In one such approach, an additional beam scanning procedure removes carbonaceous impurities via oxidation from metal–carbon deposits (e.g., PtC 5) in the presence of H 2O or O 2 after deposition. So far, critical aspects of the oxidation reaction remain unclear; experiments reveal clearly that electron stimulated oxidation drives the process yet it is not understood why H 2O purifies by a bottom-up mechanism while O 2 purifies frommore » the top-down. The simulation results presented here suggest that the chemisorption of dissolved O 2 at buried Pt nanoparticle surfaces controls purification in the top-down case while both the high relative solubility coupled with weak physisorption of H 2O explains the bottom-up process. Crucial too is the role that the carbonaceous contaminant itself has on the dissolution and diffusion of O 2 and H 2O. The results pave the way for simulation driven experiments where (1) the transient densification of the deposit can be accounted for in the initial deposit design stage and (2) the deposition and purification steps can be combined.« less

  15. Electron nanoprobe induced oxidation: A simulation of direct-write purification

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Fowlkes, J. D.; Geier, B.; Lewis, B. B.

    Electron beam direct-write has recently taken a large step forward with the advent of methods to purify deposits. This development has opened the door for future direct-write device prototyping and editing. In one such approach, an additional beam scanning procedure removes carbonaceous impurities via oxidation from metal–carbon deposits (e.g., PtC 5) in the presence of H 2O or O 2 after deposition. So far, critical aspects of the oxidation reaction remain unclear; experiments reveal clearly that electron stimulated oxidation drives the process yet it is not understood why H 2O purifies by a bottom-up mechanism while O 2 purifies frommore » the top-down. The simulation results presented here suggest that the chemisorption of dissolved O 2 at buried Pt nanoparticle surfaces controls purification in the top-down case while both the high relative solubility coupled with weak physisorption of H 2O explains the bottom-up process. Crucial too is the role that the carbonaceous contaminant itself has on the dissolution and diffusion of O 2 and H 2O. The results pave the way for simulation driven experiments where (1) the transient densification of the deposit can be accounted for in the initial deposit design stage and (2) the deposition and purification steps can be combined.« less

  16. Direct writing on graphene 'paper' by manipulating electrons as 'invisible ink'.

    PubMed

    Zhang, Wei; Zhang, Qiang; Zhao, Meng-Qiang; Kuhn, Luise Theil

    2013-07-12

    The combination of self-assembly (bottom up) and nano-imprint lithography (top down) is an efficient and effective way to record information at the nanoscale by writing. The use of an electron beam for writing is quite a promising strategy; however, the 'paper' on which to save the information is not yet fully realized. Herein, graphene was selected as the thinnest paper for recording information at the nanoscale. In a transmission electron microscope, in situ high precision writing and drawing were achieved on graphene nanosheets by manipulating electrons with a 1 nm probe (probe current ~2 × 10(-9) A m(-2)) in scanning transmission electron microscopy (STEM) mode. Under electron probe irradiation, the carbon atom tends to displace within a crystalline specimen, and dangling bonds are formed from the original sp(2) bonding after local carbon atoms have been kicked off. The absorbed random foreign amorphous carbon assembles along the line of the scanning direction induced by secondary electrons and is immobilized near the edge. With the ultralow secondary electron yield of the graphene, additional foreign atoms determining the accuracy of the pattern have been greatly reduced near the targeting region. Therefore, the electron probe in STEM mode serves as invisible ink for nanoscale writing and drawing. These results not only shed new light on the application of graphene by the interaction of different forms of carbon, but also illuminate the interaction of different carbon forms through electron beams.

  17. High-resolution computer-generated reflection holograms with three-dimensional effects written directly on a silicon surface by a femtosecond laser.

    PubMed

    Wædegaard, Kristian J; Balling, Peter

    2011-02-14

    An infrared femtosecond laser has been used to write computer-generated holograms directly on a silicon surface. The high resolution offered by short-pulse laser ablation is employed to write highly detailed holograms with resolution up to 111 kpixels/mm2. It is demonstrated how three-dimensional effects can be realized in computer-generated holograms. Three-dimensional effects are visualized as a relative motion between different parts of the holographic reconstruction, when the hologram is moved relative to the reconstructing laser beam. Potential security applications are briefly discussed.

  18. Lithography with MeV Energy Ions for Biomedical Applications: Accelerator Considerations

    NASA Astrophysics Data System (ADS)

    Sangyuenyongpipat, S.; Whitlow, H. J.; Nakagawa, S. T.; Yoshida, E.

    2009-03-01

    MeV ion beam lithographies are very powerful techniques for 3D direct writing in positive or negtive photoresist materials. Nanometer-scale rough structures, or clear areas with straight vertical sidewalls as thin as a few 10's of nm in a resist of a few nm to 100 μm thickness can be made. These capabilities are particularly useful for lithography in cellular- and sub-cellular level biomedical research and technology applications. It can be used for tailor making special structures such as optical waveguides, biosensors, DNA sorters, spotting plates, systems for DNA, protein and cell separation, special cell-growth substrates and microfluidic lab-on-a-chip devices. Furthermore MeV ion beam lithography can be used for rapid prototyping, and also making master stamps and moulds for mass production by hot embossing and nanoimprint lithography. The accelerator requirements for three different high energy ion beam lithography techniques are overviewed. We consider the special requirements placed on the accelerator and how this is achieved for a commercial proton beam writing tool.

  19. Acquisition and replay systems for direct-to-digital holography and holovision

    DOEpatents

    Thomas, Clarence E.; Hanson, Gregory R.

    2003-02-25

    Improvements to the acquisition and replay systems for direct-to-digital holography and holovision are described. A method of recording an off-axis hologram includes: splitting a laser beam into an object beam and a reference beam; reflecting the reference beam from a reference beam mirror; reflecting the object beam from an illumination beamsplitter; passing the object beam through an objective lens; reflecting the object beam from an object; focusing the reference beam and the object beam at a focal plane of a digital recorder to form an off-axis hologram; digitally recording the off-axis hologram; and transforming the off-axis hologram in accordance with a Fourier transform to obtain a set of results. A method of writing an off-axis hologram includes: passing a laser beam through a spatial light modulator; and focusing the laser beam at a focal plane of a photorefractive crystal to impose a holographic diffraction grating pattern on the photorefractive crystal. A method of replaying an off-axis hologram includes: illuminating a photorefractive crystal having a holographic diffraction grating with a replay beam.

  20. Optical superimposed vortex beams generated by integrated holographic plates with blazed grating

    NASA Astrophysics Data System (ADS)

    Zhang, Xue-Dong; Su, Ya-Hui; Ni, Jin-Cheng; Wang, Zhong-Yu; Wang, Yu-Long; Wang, Chao-Wei; Ren, Fei-Fei; Zhang, Zhen; Fan, Hua; Zhang, Wei-Jie; Li, Guo-Qiang; Hu, Yan-Lei; Li, Jia-Wen; Wu, Dong; Chu, Jia-Ru

    2017-08-01

    In this paper, we demonstrate that the superposition of two vortex beams with controlled topological charges can be realized by integrating two holographic plates with blazed grating. First, the holographic plate with blazed grating was designed and fabricated by laser direct writing for generating well-separated vortex beam. Then, the relationship between the periods of blazed grating and the discrete angles of vortex beams was systemically investigated. Finally, through setting the discrete angle and different revolving direction of the holographic plates, the composite fork-shaped field was realized by the superposition of two vortex beams in a particular position. The topological charges of composite fork-shaped field (l = 1, 0, 3, and 4) depend on the topological charges of compositional vortex beams, which are well agreed with the theoretical simulation. The method opens up a wide range of opportunities and possibilities for applying in optical communication, optical manipulations, and photonic integrated circuits.

  1. 3-dimensional free standing micro-structures by proton beam writing of Su 8-silver nanoParticle polymeric composite

    NASA Astrophysics Data System (ADS)

    Igbenehi, H.; Jiguet, S.

    2012-09-01

    Proton beam lithography a maskless direct-write lithographic technique (well suited for producing 3-Dimensional microstructures in a range of resist and semiconductor materials) is demonstrated as an effective tool in the creation of electrically conductive freestanding micro-structures in an Su 8 + Nano Silver polymer composite. The structures produced show non-ohmic conductivity and fit the percolation theory conduction model of tunneling of separated nanoparticles. Measurements show threshold switching and a change in conductivity of at least 4 orders of magnitude. The predictable range of protons in materials at a given energy is exploited in the creation of high aspect ratio, free standing micro-structures, made from a commercially available SU8 Silver nano-composite (GMC3060 form Gersteltec Inc. a negative tone photo-epoxy with added metallic nano-particles(Silver)) to create films with enhanced electrical properties when exposed and cured. Nano-composite films are directly written on with a finely focused MeV accelerated Proton particle beam. The energy loss of the incident proton beams in the target polymer nano- composite film is concentrated at the end of its range, where damage occurs; changing the chemistry of the nano-composite film via an acid initiated polymerization - creating conduction paths. Changing the energy of the incident beams provide exposed regions with different penetration and damage depth - exploited in the demonstrated cantilever microstructure.

  2. Direct-write liquid phase transformations with a scanning transmission electron microscope

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Unocic, Raymond R.; Lupini, Andrew R.; Borisevich, Albina Y.

    The highly energetic electron beam from a scanning transmission electron microscope (STEM) can induce local changes in the state of matter, ranging from local knock-out and atomic movement, to amorphization/crystallization, and chemical/electrochemical reactions occuring at localized liquid-solid and gas-solid interfaces. To date, fundamental studies of e-beam induced phenomena and practical applications have been limited by conventional e-beam rastering modes that allow only for uniform e-beam exposures. Here we develop an automated liquid phase nanolithography method that is capable of directly writing nanometer scaled features within silicon nitride encapsulated liquid cells. An external beam control system, connected to the scan coilsmore » of an aberration-corrected STEM, is used to precisely control the position, dwell time, and scan velocity of a sub-nanometer STEM probe. Site-specific locations in a sealed liquid cell containing an aqueous solution of H 2PdCl 4 are irradiated to controllably deposit palladium onto silicon nitride membranes. We determine the threshold electron dose required for the radiolytic deposition of metallic palladium, explore the influence of electron dose on the feature size and morphology of nanolithographically patterned nanostructures, and propose a feedback-controlled monitoring method for active control of the nanofabricated structures through STEM detector signal monitoring. As a result, this approach enables both fundamental studies of electron beam induced interactions with matter, as well as opens a pathway to fabricate nanostructures with tailored architectures and chemistries via shape-controlled nanolithographic patterning from liquid phase precursors.« less

  3. Direct-write liquid phase transformations with a scanning transmission electron microscope

    DOE PAGES

    Unocic, Raymond R.; Lupini, Andrew R.; Borisevich, Albina Y.; ...

    2016-08-03

    The highly energetic electron beam from a scanning transmission electron microscope (STEM) can induce local changes in the state of matter, ranging from local knock-out and atomic movement, to amorphization/crystallization, and chemical/electrochemical reactions occuring at localized liquid-solid and gas-solid interfaces. To date, fundamental studies of e-beam induced phenomena and practical applications have been limited by conventional e-beam rastering modes that allow only for uniform e-beam exposures. Here we develop an automated liquid phase nanolithography method that is capable of directly writing nanometer scaled features within silicon nitride encapsulated liquid cells. An external beam control system, connected to the scan coilsmore » of an aberration-corrected STEM, is used to precisely control the position, dwell time, and scan velocity of a sub-nanometer STEM probe. Site-specific locations in a sealed liquid cell containing an aqueous solution of H 2PdCl 4 are irradiated to controllably deposit palladium onto silicon nitride membranes. We determine the threshold electron dose required for the radiolytic deposition of metallic palladium, explore the influence of electron dose on the feature size and morphology of nanolithographically patterned nanostructures, and propose a feedback-controlled monitoring method for active control of the nanofabricated structures through STEM detector signal monitoring. As a result, this approach enables both fundamental studies of electron beam induced interactions with matter, as well as opens a pathway to fabricate nanostructures with tailored architectures and chemistries via shape-controlled nanolithographic patterning from liquid phase precursors.« less

  4. Direct-writing lithography using laser diode beam focused with single elliptical microlens

    NASA Astrophysics Data System (ADS)

    Hasan, Md. Nazmul; Haque, Muttahid-Ull; Trisno, Jonathan; Lee, Yung-Chun

    2015-10-01

    A lithography method is proposed for arbitrary patterning using an elliptically diverging laser diode beam focused with a single planoconvex elliptical microlens. Simulations are performed to model the propagation properties of the laser beam and to design the elliptical microlens, which has two different profiles in the x- and y-axis directions. The microlens is fabricated using an excimer laser dragging method and is then attached to the laser diode using double-sided optically cleared adhesive (OCA) tape. Notably, the use of OCA tape removes the need for a complicated alignment procedure and thus significantly reduces the assembly cost. The minimum focused spot of the laser diode beam is investigated by performing single-shot exposure tests on a photoresist (PR) layer. Finally, the practical feasibility of this lithography technique to generate an arbitrary pattern is demonstrated by dotted and continuous features through thin chromium layer deposition on PR and a metal lift-off process. The results show that the minimum feature size for the dotted patterns is around 6.23 μm, while the minimum linewidths for continuous patterns is 6.44 μm. In other words, the proposed focusing technique has significant potential for writing any arbitrary high-resolution pattern for applications like printed circuit board fabrication.

  5. Fabrication of multi-scale periodic surface structures on Ti-6Al-4V by direct laser writing and direct laser interference patterning for modified wettability applications

    NASA Astrophysics Data System (ADS)

    Huerta-Murillo, D.; Aguilar-Morales, A. I.; Alamri, S.; Cardoso, J. T.; Jagdheesh, R.; Lasagni, A. F.; Ocaña, J. L.

    2017-11-01

    In this work, hierarchical surface patterns fabricated on Ti-6Al-4V alloy combining two laser micro-machining techniques are presented. The used technologies are based on nanosecond Direct Laser Writing and picosecond Direct Laser Interference Patterning. Squared shape micro-cells with different hatch distances were produced by Direct Laser Writing with depths values in the micro-scale, forming a well-defined closed packet. Subsequently, cross-like periodic patterns were fabricated by means of Direct Laser Interference Patterning using a two-beam configuration, generating a dual-scale periodic surface structure in both micro- and nano-scale due to the formation of Laser-Induced Periodic Surface Structure after the picosecond process. As a result a triple hierarchical periodic surface structure was generated. The surface morphology of the irradiated area was characterized with scanning electron microscopy and confocal microscopy. Additionally, static contact angle measurements were made to analyze the wettability behavior of the structures, showing a hydrophobic behavior for the hierarchical structures.

  6. Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital E-beam direct write lithography and scanning electron microscopy

    DOEpatents

    Thomas, Clarence E.; Baylor, Larry R.; Voelkl, Edgar; Simpson, Michael L.; Paulus, Michael J.; Lowndes, Douglas H.; Whealton, John H.; Whitson, John C.; Wilgen, John B.

    2002-12-24

    Systems and methods are described for addressable field emission array (AFEA) chips. A method of operating an addressable field-emission array, includes: generating a plurality of electron beams from a pluralitly of emitters that compose the addressable field-emission array; and focusing at least one of the plurality of electron beams with an on-chip electrostatic focusing stack. The systems and methods provide advantages including the avoidance of space-charge blow-up.

  7. Plasmonic direct writing lithography with a macroscopical contact probe

    NASA Astrophysics Data System (ADS)

    Huang, Yuerong; Liu, Ling; Wang, Changtao; Chen, Weidong; Liu, Yunyue; Li, Ling

    2018-05-01

    In this work, we design a plasmonic direct writing lithography system with a macroscopical contact probe to achieve nanometer scale spots. The probe with bowtie-shaped aperture array adopts spring hinge and beam deflection method (BDM) to realize near-field lithography. Lithography results show that a macroscopical plasmonic contact probe can achieve a patterning resolution of around 75 nm at 365 nm wavelength, and demonstrate that the lithography system is promising for practical applications due to beyond the diffraction limit, low cost, and simplification of system configuration. CST calculations provide a guide for the design of recording structure and the arrangement of placing polarizer.

  8. MAPPER: high-throughput maskless lithography

    NASA Astrophysics Data System (ADS)

    Wieland, M. J.; de Boer, G.; ten Berge, G. F.; Jager, R.; van de Peut, T.; Peijster, J. J. M.; Slot, E.; Steenbrink, S. W. H. K.; Teepen, T. F.; van Veen, A. H. V.; Kampherbeek, B. J.

    2009-03-01

    Maskless electron beam lithography, or electron beam direct write, has been around for a long time in the semiconductor industry and was pioneered from the mid-1960s onwards. This technique has been used for mask writing applications as well as device engineering and in some cases chip manufacturing. However because of its relatively low throughput compared to optical lithography, electron beam lithography has never been the mainstream lithography technology. To extend optical lithography double patterning, as a bridging technology, and EUV lithography are currently explored. Irrespective of the technical viability of both approaches, one thing seems clear. They will be expensive [1]. MAPPER Lithography is developing a maskless lithography technology based on massively-parallel electron-beam writing with high speed optical data transport for switching the electron beams. In this way optical columns can be made with a throughput of 10-20 wafers per hour. By clustering several of these columns together high throughputs can be realized in a small footprint. This enables a highly cost-competitive alternative to double patterning and EUV alternatives. In 2007 MAPPER obtained its Proof of Lithography milestone by exposing in its Demonstrator 45 nm half pitch structures with 110 electron beams in parallel, where all the beams where individually switched on and off [2]. In 2008 MAPPER has taken a next step in its development by building several tools. The objective of building these tools is to involve semiconductor companies to be able to verify tool performance in their own environment. To enable this, the tools will have a 300 mm wafer stage in addition to a 110-beam optics column. First exposures at 45 nm half pitch resolution have been performed and analyzed. On the same wafer it is observed that all beams print and based on analysis of 11 beams the CD for the different patterns is within 2.2 nm from target and the CD uniformity for the different patterns is better than 2.8 nm.

  9. Transverse writing of three-dimensional tubular optical waveguides in glass with a slit-shaped femtosecond laser beam

    PubMed Central

    Liao, Yang; Qi, Jia; Wang, Peng; Chu, Wei; Wang, Zhaohui; Qiao, Lingling; Cheng, Ya

    2016-01-01

    We report on fabrication of tubular optical waveguides buried in ZBLAN glass based on transverse femtosecond laser direct writing. Irradiation in ZBLAN with focused femtosecond laser pulses leads to decrease of refractive index in the modified region. Tubular optical waveguides of variable mode areas are fabricated by forming the four sides of the cladding with slit-shaped femtosecond laser pulses, ensuring single mode waveguiding with a mode field dimension as small as ~4 μm. PMID:27346285

  10. Non-CAR resists and advanced materials for Massively Parallel E-Beam Direct Write process integration

    NASA Astrophysics Data System (ADS)

    Pourteau, Marie-Line; Servin, Isabelle; Lepinay, Kévin; Essomba, Cyrille; Dal'Zotto, Bernard; Pradelles, Jonathan; Lattard, Ludovic; Brandt, Pieter; Wieland, Marco

    2016-03-01

    The emerging Massively Parallel-Electron Beam Direct Write (MP-EBDW) is an attractive high resolution high throughput lithography technology. As previously shown, Chemically Amplified Resists (CARs) meet process/integration specifications in terms of dose-to-size, resolution, contrast, and energy latitude. However, they are still limited by their line width roughness. To overcome this issue, we tested an alternative advanced non-CAR and showed it brings a substantial gain in sensitivity compared to CAR. We also implemented and assessed in-line post-lithographic treatments for roughness mitigation. For outgassing-reduction purpose, a top-coat layer is added to the total process stack. A new generation top-coat was tested and showed improved printing performances compared to the previous product, especially avoiding dark erosion: SEM cross-section showed a straight pattern profile. A spin-coatable charge dissipation layer based on conductive polyaniline has also been tested for conductivity and lithographic performances, and compatibility experiments revealed that the underlying resist type has to be carefully chosen when using this product. Finally, the Process Of Reference (POR) trilayer stack defined for 5 kV multi-e-beam lithography was successfully etched with well opened and straight patterns, and no lithography-etch bias.

  11. Bessel-Gauss beams as rigorous solutions of the Helmholtz equation.

    PubMed

    April, Alexandre

    2011-10-01

    The study of the nonparaxial propagation of optical beams has received considerable attention. In particular, the so-called complex-source/sink model can be used to describe strongly focused beams near the beam waist, but this method has not yet been applied to the Bessel-Gauss (BG) beam. In this paper, the complex-source/sink solution for the nonparaxial BG beam is expressed as a superposition of nonparaxial elegant Laguerre-Gaussian beams. This provides a direct way to write the explicit expression for a tightly focused BG beam that is an exact solution of the Helmholtz equation. It reduces correctly to the paraxial BG beam, the nonparaxial Gaussian beam, and the Bessel beam in the appropriate limits. The analytical expression can be used to calculate the field of a BG beam near its waist, and it may be useful in investigating the features of BG beams under tight focusing conditions.

  12. Electron beam enhanced surface modification for making highly resolved structures

    DOEpatents

    Pitts, John R.

    1986-01-01

    A method for forming high resolution submicron structures on a substrate is provided by direct writing with a submicron electron beam in a partial pressure of a selected gas phase characterized by the ability to dissociate under the beam into a stable gaseous leaving group and a reactant fragment that combines with the substrate material under beam energy to form at least a surface compound. Variations of the method provide semiconductor device regions on doped silicon substrates, interconnect lines between active sites, three dimensional electronic chip structures, electron beam and optical read mass storage devices that may include color differentiated data areas, and resist areas for use with selective etching techniques.

  13. Electron beam enhanced surface modification for making highly resolved structures

    DOEpatents

    Pitts, J.R.

    1984-10-10

    A method for forming high resolution submicron structures on a substrate is provided by direct writing with a submicron electron beam in a partial pressure of a selected gas phase characterized by the ability to dissociate under the beam into a stable gaseous leaving group and a reactant fragment that combines with the substrate material under beam energy to form at least a surface compound. Variations of the method provide semiconductor device regions on doped silicon substrates, interconnect lines between active sites, three dimensional electronic chip structures, electron beam and optical read mass storage devices that may include color differentiated data areas, and resist areas for use with selective etching techniques.

  14. Note: Laser beam scanning using a ferroelectric liquid crystal spatial light modulator

    NASA Astrophysics Data System (ADS)

    Das, Abhijit; Boruah, Bosanta R.

    2014-04-01

    In this work we describe laser beam scanning using a ferroelectric liquid crystal spatial light modulator. Commercially available ferroelectric liquid crystal spatial light modulators are capable of displaying 85 colored images in 1 s using a time dithering technique. Each colored image, in fact, comprises 24 single bit (black and white) images displayed sequentially. We have used each single bit image to write a binary phase hologram. For a collimated laser beam incident on the hologram, one of the diffracted beams can be made to travel along a user defined direction. We have constructed a beam scanner employing the above arrangement and demonstrated its use to scan a single laser beam in a laser scanning optical sectioning microscope setup.

  15. High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Growth Fundamentals

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Winkler, Robert; Lewis, Brett B.; Fowlkes, Jason Davidson

    While 3D-printing is currently experiencing significant growth and having a significant impact on science and technology, the expansion into the nanoworld is still a highly challenging task. Among the increasing number of approaches, focused electron-beam-induced deposition (FEBID) was recently demonstrated to be a viable candidate toward a generic direct-write fabrication technology with spatial nanometer accuracy for complex shaped 3D-nanoarchitectures. In this comprehensive study, we explore the parameter space for 3D-FEBID and investigate the implications of individual and interdependent parameters on freestanding nanosegments, which act as a fundamental building block for complex 3D-structures. In particular, the study provides new basic insightsmore » such as precursor transport limitations and angle dependent growth rates, both essential for high-fidelity fabrication. In conclusion, complemented by practical aspects, we provide both basic insights in 3D-growth dynamics and technical guidance for specific process adaption to enable predictable and reliable direct-write synthesis of freestanding 3D-nanoarchitectures.« less

  16. High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Growth Fundamentals

    DOE PAGES

    Winkler, Robert; Lewis, Brett B.; Fowlkes, Jason Davidson; ...

    2018-02-14

    While 3D-printing is currently experiencing significant growth and having a significant impact on science and technology, the expansion into the nanoworld is still a highly challenging task. Among the increasing number of approaches, focused electron-beam-induced deposition (FEBID) was recently demonstrated to be a viable candidate toward a generic direct-write fabrication technology with spatial nanometer accuracy for complex shaped 3D-nanoarchitectures. In this comprehensive study, we explore the parameter space for 3D-FEBID and investigate the implications of individual and interdependent parameters on freestanding nanosegments, which act as a fundamental building block for complex 3D-structures. In particular, the study provides new basic insightsmore » such as precursor transport limitations and angle dependent growth rates, both essential for high-fidelity fabrication. In conclusion, complemented by practical aspects, we provide both basic insights in 3D-growth dynamics and technical guidance for specific process adaption to enable predictable and reliable direct-write synthesis of freestanding 3D-nanoarchitectures.« less

  17. Zone-boundary optimization for direct laser writing of continuous-relief diffractive optical elements.

    PubMed

    Korolkov, Victor P; Nasyrov, Ruslan K; Shimansky, Ruslan V

    2006-01-01

    Enhancing the diffraction efficiency of continuous-relief diffractive optical elements fabricated by direct laser writing is discussed. A new method of zone-boundary optimization is proposed to correct exposure data only in narrow areas along the boundaries of diffractive zones. The optimization decreases the loss of diffraction efficiency related to convolution of a desired phase profile with a writing-beam intensity distribution. A simplified stepped transition function that describes optimized exposure data near zone boundaries can be made universal for a wide range of zone periods. The approach permits a similar increase in the diffraction efficiency as an individual-pixel optimization but with fewer computation efforts. Computer simulations demonstrated that the zone-boundary optimization for a 6 microm period grating increases the efficiency by 7% and 14.5% for 0.6 microm and 1.65 microm writing-spot diameters, respectively. The diffraction efficiency of as much as 65%-90% for 4-10 microm zone periods was obtained experimentally with this method.

  18. In-Plane Electrical Connectivity and Near-Field Concentration of Isolated Graphene Resonators Realized by Ion Beams.

    PubMed

    Luo, Weiwei; Cai, Wei; Xiang, Yinxiao; Wu, Wei; Shi, Bin; Jiang, Xiaojie; Zhang, Ni; Ren, Mengxin; Zhang, Xinzheng; Xu, Jingjun

    2017-08-01

    Graphene plasmons provide great opportunities in light-matter interactions benefiting from the extreme confinement and electrical tunability. Structured graphene cavities possess enhanced confinements in 3D and steerable plasmon resonances, potential in applications for sensing and emission control at the nanoscale. Besides graphene boundaries obtained by mask lithography, graphene defects engineered by ion beams have shown efficient plasmon reflections. In this paper, near-field responses of structured graphene achieved by ion beam direct-writing are investigated. Graphene nanoresonators are fabricated easily and precisely with a spatial resolution better than 30 nm. Breathing modes are observed in graphene disks. The amorphous carbons around weaken the response of edge modes in the resonators, but meanwhile render the isolated resonators in-plane electrical connections, where near-fields are proved gate-tunable. The realization of gate-tunable near-fields of graphene 2D resonators opens up tunable near-field couplings with matters. Moreover, graphene nonconcentric rings with engineered near-field confinement distributions are demonstrated, where the quadrupole plasmon modes are excited. Near-field mappings reveal concentrations at the scale of 3.8×10-4λ02 within certain zones which can be engineered. The realization of electrically tunable graphene nanoresonators by ion beam direct-writing is promising for active manipulation of emission and sensing at the nanoscale. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  19. Josephson junction

    DOEpatents

    Wendt, J.R.; Plut, T.A.; Martens, J.S.

    1995-05-02

    A novel method for fabricating nanometer geometry electronic devices is described. Such Josephson junctions can be accurately and reproducibly manufactured employing photolithographic and direct write electron beam lithography techniques in combination with aqueous etchants. In particular, a method is described for manufacturing planar Josephson junctions from high temperature superconducting material. 10 figs.

  20. Recording polarization gratings with a standing spiral wave

    NASA Astrophysics Data System (ADS)

    Vernon, Jonathan P.; Serak, Svetlana V.; Hakobyan, Rafik S.; Aleksanyan, Artur K.; Tondiglia, Vincent P.; White, Timothy J.; Bunning, Timothy J.; Tabiryan, Nelson V.

    2013-11-01

    A scalable and robust methodology for writing cycloidal modulation patterns of optical axis orientation in photosensitive surface alignment layers is demonstrated. Counterpropagating circularly polarized beams, generated by reflection of the input beam from a cholesteric liquid crystal, direct local surface orientation in a photosensitive surface. Purposely introducing a slight angle between the input beam and the photosensitive surface normal introduces a grating period/orientation that is readily controlled and templated. The resulting cycloidal diffractive waveplates offer utility in technologies requiring diffraction over a broad range of angles/wavelengths. This simple methodology of forming polarization gratings offers advantages over conventional fabrication techniques.

  1. And There Was Light: Prospects for the Creation of Micro- and Nanostructures through Maskless Photolithography.

    PubMed

    Rühe, J

    2017-09-26

    In photolithographic processes, the light inducing the photochemical reactions is confined to a small volume, which enables direct writing of micro- and nanoscale features onto solid surfaces without the need of a predefined photomask. The direct writing process can be used to generate topographic patterns through photopolymerization or photo-cross-linking or can be employed to use light to generate chemical patterns on the surface with high spatial control, which would make such processes attractive for bioapplications. The prospects of maskless photolithography technologies with a focus on two-photon lithography and scanning-probe-based photochemical processes based on scanning near-field optical microscopy or beam pen lithography are discussed.

  2. Roughness measurements on coupling structures for optical interconnections integrated on a printed circuit board

    NASA Astrophysics Data System (ADS)

    Hendrickx, Nina; Van Erps, Jürgen; Suyal, Himanshu; Taghizadeh, Mohammad; Thienpont, Hugo; Van Daele, Peter

    2006-04-01

    In this paper, laser ablation (at UGent), deep proton writing (at VUB) and laser direct writing (at HWU) are presented as versatile technologies that can be used for the fabrication of coupling structures for optical interconnections integrated on a printed circuit board (PCB). The optical layer, a highly cross-linked acrylate based polymer, is applied on an FR4 substrate. Both laser ablation and laser direct writing are used for the definition of arrays of multimode optical waveguides, which guide the light in the plane of the optical layer. In order to couple light vertically in/out of the plane of the optical waveguides, coupling structures have to be integrated into the optical layer. Out-of-plane turning mirrors, that deflect the light beam over 90°, are used for this purpose. The surface roughness and angle of three mirror configurations are evaluated: a laser ablated one that is integrated into the optical waveguide, a laser direct written one that is also directly written onto the waveguide and a DPW insert that is plugged into a cavity into the waveguiding layer.

  3. Long-period fibre grating writing with a slit-apertured femtosecond laser beam (λ = 1026 nm)

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Dostovalov, A V; Wolf, A A; Babin, S A

    We report on long-period grating (LPG) writing in a standard telecom fibre, SMF-28e+, via refractive index modification by femtosecond pulses. A method is proposed for grating writing with a slit-apertured beam, which enables one to produce LPGs with reduced background losses and a resonance peak markedly stronger than that in the case of grating writing with a Gaussian beam. The method can be used to fabricate LPGs for use as spectral filters of fibre lasers and sensing elements of sensor systems. (fibre and integrated-optical structures)

  4. Characterization of submillisecond response optical addressing phase modulator based on low light scattering polymer network liquid crystal

    NASA Astrophysics Data System (ADS)

    Xiangjie, Zhao; Cangli, Liu; Jiazhu, Duan; Dayong, Zhang; Yongquan, Luo

    2015-01-01

    Optically addressed conventional nematic liquid crystal spatial light modulator has attracted wide research interests. But the slow response speed limited its further application. In this paper, polymer network liquid crystal (PNLC) was proposed to replace the conventional nematic liquid crystal to enhance the response time to the order of submillisecond. The maximum light scattering of the employed PNLC was suppressed to be less than 2% at 1.064 μm by optimizing polymerization conditions and selecting large viscosity liquid crystal as solvent. The occurrence of phase ripple phenomenon due to electron diffusion and drift in photoconductor was found to deteriorate the phase modulation effect of the optical addressed PNLC phase modulator. The wavelength effect and AC voltage frequency effect on the on state dynamic response of phase change was investigated by experimental methods. These effects were interpreted by electron diffusion and drift theory based on the assumption that free electron was inhomogeneously distributed in accordance with the writing beam intensity distribution along the incident direction. The experimental results indicated that the phase ripple could be suppressed by optimizing the wavelength of the writing beam and the driving AC voltage frequency when varying the writing beam intensity to generate phase change in 2π range. The modulation transfer function was also measured.

  5. DOE Office of Scientific and Technical Information (OSTI.GOV)

    Pacheco, J. L.; Singh, M.; Perry, D. L.

    Here, we demonstrate a capability of deterministic doping at the single atom level using a combination of direct write focused ion beam and solid-state ion detectors. The focused ion beam system can position a single ion to within 35 nm of a targeted location and the detection system is sensitive to single low energy heavy ions. This platform can be used to deterministically fabricate single atom devices in materials where the nanostructure and ion detectors can be integrated, including donor-based qubits in Si and color centers in diamond.

  6. Fabrication and Characterization of Three Dimensional Photonic Crystals Generated by Multibeam Interference Lithography

    DTIC Science & Technology

    2009-01-01

    and J. A. Lewis, "Microperiodic structures - Direct writing of three-dimensional webs ," Nature, vol. 428, pp. 386-386, 2004. [9] M. Campbell, D. N...of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers , vol. 44, pp. 6355-6367, 2005. [75] P. Cloetens, W. Ludwig, J... paper screen on the sample holder and marking the beam position. If the central beam is properly aligned, the spot on the screen remains at the

  7. Verification of E-Beam direct write integration into 28nm BEOL SRAM technology

    NASA Astrophysics Data System (ADS)

    Hohle, Christoph; Choi, Kang-Hoon; Gutsch, Manuela; Hanisch, Norbert; Seidel, Robert; Steidel, Katja; Thrun, Xaver; Werner, Thomas

    2015-03-01

    Electron beam direct write lithography (EBDW) potentially offers advantages for low-volume semiconductor manufacturing, rapid prototyping or design verification due to its high flexibility without the need of costly masks. However, the integration of this advanced patterning technology into complex CMOS manufacturing processes remains challenging. The low throughput of today's single e-Beam tools limits high volume manufacturing applications and maturity of parallel (multi) beam systems is still insufficient [1,2]. Additional concerns like transistor or material damage of underlying layers during exposure at high electron density or acceleration voltage have to be addressed for advanced technology nodes. In the past we successfully proved that potential degradation effects of high-k materials or ULK shrink can be neglected and were excluded by demonstrating integrated electrical results of 28nm node transistor and BEOL performance following 50kV electron beam dry exposure [3]. Here we will give an update on the integration of EBDW in the 300mm CMOS manufacturing processes of advanced integrated circuits at the 28nm SRAM node of GLOBALFOUNDRIES Dresden. The work is an update to what has been previously published [4]. E-beam patterning results of BEOL full chip metal and via layers with a dual damascene integration scheme using a 50kV VISTEC SB3050DW variable shaped electron beam direct writer at Fraunhofer IPMSCNT are demonstrated. For the patterning of the Metal layer a Mix & Match concept based on the sequence litho - etch -litho -etch (LELE) was developed and evaluated wherein several exposure fields were blanked out during the optical exposure. Etch results are shown and compared to the POR. Results are also shown on overlay performance and optimized e-Beam exposure time using most advanced data prep solutions and resist processes. The patterning results have been verified using fully integrated electrical measurement of metal lines and vias on wafer level. In summary we demonstrate the integration capability of EBDW into a productive CMOS process flow at the example of the 28nm SRAM technology node.

  8. Direct femtosecond laser writing of buried infrared waveguides in chalcogenide glasses

    NASA Astrophysics Data System (ADS)

    Le Coq, D.; Bychkov, E.; Masselin, P.

    2016-02-01

    Direct laser writing technique is now widely used in particular in glass, to produce both passive and active photonic devices. This technique offers a real scientific opportunity to generate three-dimensional optical components and since chalcogenide glasses possess transparency properties from the visible up to mid-infrared range, they are of great interest. Moreover, they also have high optical non-linearity and high photo-sensitivity that make easy the inscription of refractive index modification. The understanding of the fundamental and physical processes induced by the laser pulses is the key to well-control the laser writing and consequently to realize integrated photonic devices. In this paper, we will focus on two different ways allowing infrared buried waveguide to be obtained. The first part will be devoted to a very original writing process based on a helical translation of the sample through the laser beam. In the second part, we will report on another original method based on both a filamentation phenomenon and a point by point technique. Finally, we will demonstrate that these two writing techniques are suitable for the design of single mode waveguide for wavelength ranging from the visible up to the infrared but also to fabricate optical components.

  9. Deep ultraviolet laser direct write for patterning sol-gel InGaZnO semiconducting micro/nanowires and improving field-effect mobility

    PubMed Central

    Lin, Hung-Cheng; Stehlin, Fabrice; Soppera, Olivier; Zan, Hsiao-Wen; Li, Chang-Hung; Wieder, Fernand; Ponche, Arnaud; Berling, Dominique; Yeh, Bo-Hung; Wang, Kuan-Hsun

    2015-01-01

    Deep-UV (DUV) laser was used to directly write indium-gallium-zinc-oxide (IGZO) precursor solution and form micro and nanoscale patterns. The directional DUV laser beam avoids the substrate heating and suppresses the diffraction effect. A IGZO precursor solution was also developed to fulfill the requirements for direct photopatterning and for achieving semi-conducting properties with thermal annealing at moderate temperature. The DUV-induced crosslinking of the starting material allows direct write of semi-conducting channels in thin-film transistors but also it improves the field-effect mobility and surface roughness. Material analysis has been carried out by XPS, FTIR, spectroscopic ellipsometry and AFM and the effect of DUV on the final material structure is discussed. The DUV irradiation step results in photolysis and a partial condensation of the inorganic network that freezes the sol-gel layer in a homogeneous distribution, lowering possibilities of thermally induced reorganization at the atomic scale. Laser irradiation allows high-resolution photopatterning and high-enough field-effect mobility, which enables the easy fabrication of oxide nanowires for applications in solar cell, display, flexible electronics, and biomedical sensors. PMID:26014902

  10. Alignment of the writing beam with the diffractive structure rotation axis in synthesis of diffractive optical elements in a polar coordinate system

    NASA Astrophysics Data System (ADS)

    Shimanskii, R. V.; Poleshchuk, A. G.; Korolkov, V. P.; Cherkashin, V. V.

    2017-03-01

    A method is developed to ensure precise alignment of the origin of a polar coordinate system in which the laser beam position is defined in writing diffractive optical elements with the optical workpiece rotation axis. This method is used to improve the accuracy of a circular laser writing system in writing large-scale diffractive optical elements in a polar coordinate system. Results of studying new algorithms of detection and correction of positioning errors of the circular laser writing system in the course of writing are reported.

  11. Ion Beam Etching: Replication of Micro Nano-structured 3D Stencil Masks

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Weber, Patrick; Guibert, Edouard; Mikhailov, Serguei

    2009-03-10

    Ion beam LIGA allows the etching of 3D nano-structures by direct writing with a nano-sized beam. However, this is a relatively time consuming process. We propose here another approach for etching structures on large surfaces and faster, compared to the direct writing process. This approach consists of replicating 3D structured masks, by scanning an unfocused ion beam. A polymer substrate is placed behind the mask, as in UV photolithography. But the main advantage is that the 3D structure of the mask can be replicated into the polymer. For that purpose, the masks (developped at LMIS1, EPFL) are made of amore » silicon nitride membrane 100 nm thick, on which 3D gold structures up to 200 nm thick, are deposited. The 3D Au structures are made with the nanostencil method, based on successive gold deposition. The IMA institute, from HE-Arc, owns a High Voltage Engineering 1.7 MV Tandetron with both solid and gaseous negative ion sources, able to generate ions from almost every chemical element in a broad range of energies comprised between 400 keV and 6.8 MeV. The beam composition and energy are chosen in such a way, that ions lose a significant fraction of their energy when passing through the thickest regions of the mask. Ions passing through thinner regions of the mask loose a smaller fraction of their energy and etch the polymer with larger thicknesses, allowing a replication of the mask into the polymer. For our trials, we have used a carbon beam with an energy of 500 keV. The beam was focussed to a diameter of 5 mm with solid slits, in order to avoid border effects and thus ensure a homogeneous dose distribution on the beam diameter. The feasibility of this technique has been demonstrated, allowing industrial applications for micro-mould fabrication, micro-fluidics and micro-optics.« less

  12. Directed block copolymer self-assembly implemented via surface-embedded electrets

    NASA Astrophysics Data System (ADS)

    Wu, Mei-Ling; Wang, Dong; Wan, Li-Jun

    2016-02-01

    Block copolymer (BCP) nanolithography is widely recognized as a promising complementary approach to circumvent the feature size limits of conventional photolithography. The directed self-assembly of BCP thin film to form ordered nanostructures with controlled orientation and localized pattern has been the key challenge for practical nanolithography applications. Here we show that BCP nanopatterns can be directed on localized surface electrets defined by electron-beam irradiation to realize diverse features in a simple, effective and non-destructive manner. Charged electrets can generate a built-in electric field in BCP thin film and induce the formation of perpendicularly oriented microdomain of BCP film. The electret-directed orientation control of BCP film can be either integrated with mask-based patterning technique or realized by electron-beam direct-writing method to fabricate microscale arbitrary lateral patterns down to single BCP cylinder nanopattern. The electret-directed BCP self-assembly could provide an alternative means for BCP-based nanolithography, with high resolution.

  13. Time-resolved scanning Kerr microscopy of flux beam formation in hard disk write heads

    NASA Astrophysics Data System (ADS)

    Valkass, Robert A. J.; Spicer, Timothy M.; Burgos Parra, Erick; Hicken, Robert J.; Bashir, Muhammad A.; Gubbins, Mark A.; Czoschke, Peter J.; Lopusnik, Radek

    2016-06-01

    To meet growing data storage needs, the density of data stored on hard disk drives must increase. In pursuit of this aim, the magnetodynamics of the hard disk write head must be characterized and understood, particularly the process of "flux beaming." In this study, seven different configurations of perpendicular magnetic recording (PMR) write heads were imaged using time-resolved scanning Kerr microscopy, revealing their detailed dynamic magnetic state during the write process. It was found that the precise position and number of driving coils can significantly alter the formation of flux beams during the write process. These results are applicable to the design and understanding of current PMR and next-generation heat-assisted magnetic recording devices, as well as being relevant to other magnetic devices.

  14. Box 11: Tissue Engineering and Bioscience Methods Using Proton Beam Writing

    NASA Astrophysics Data System (ADS)

    van Kan, J. A.

    Tissue engineering is a rapidly developing and highly interdisciplinary field that applies the principles of cell biology, engineering, and materials science to the culture of biological tissue. The artificially grown tissue then can be implanted directly into the body, or it can form part of a device that replaces organ functionality.

  15. Direct write of copper-graphene composite using micro-cold spray

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Dardona, Sameh, E-mail: dardona@utrc.utc.com; She, Ying; Schmidt, Wayde R.

    Direct write of a new class of composite materials containing copper and graphene in the powder phase is described. The composite was synthesized using batch electroless plating of copper for various times onto Nano Graphene Platelets (NGP) to control the amount of copper deposited within the loosely aggregated graphene powder. Copper deposition was confirmed by both Focused Ion Beam (FIB) and Auger electron spectroscopic analysis. A micro-cold spray technique was used to deposit traces that are ∼230 μm wide and ∼5 μm thick of the formulated copper/graphene powder onto a glass substrate. The deposited traces were found to have goodmore » adhesion to the substrate with ∼65x the copper bulk resistivity.« less

  16. Spatially modulated laser pulses for printing electronics.

    PubMed

    Auyeung, Raymond C Y; Kim, Heungsoo; Mathews, Scott; Piqué, Alberto

    2015-11-01

    The use of a digital micromirror device (DMD) in laser-induced forward transfer (LIFT) is reviewed. Combining this technique with high-viscosity donor ink (silver nanopaste) results in laser-printed features that are highly congruent in shape and size to the incident laser beam spatial profile. The DMD empowers LIFT to become a highly parallel, rapidly reconfigurable direct-write technology. By adapting half-toning techniques to the DMD bitmap image, the laser transfer threshold fluence for 10 μm features can be reduced using an edge-enhanced beam profile. The integration of LIFT with this beam-shaping technique allows the printing of complex large-area patterns with a single laser pulse.

  17. Electron-Beam-Induced Deposition as a Technique for Analysis of Precursor Molecule Diffusion Barriers and Prefactors.

    PubMed

    Cullen, Jared; Lobo, Charlene J; Ford, Michael J; Toth, Milos

    2015-09-30

    Electron-beam-induced deposition (EBID) is a direct-write chemical vapor deposition technique in which an electron beam is used for precursor dissociation. Here we show that Arrhenius analysis of the deposition rates of nanostructures grown by EBID can be used to deduce the diffusion energies and corresponding preexponential factors of EBID precursor molecules. We explain the limitations of this approach, define growth conditions needed to minimize errors, and explain why the errors increase systematically as EBID parameters diverge from ideal growth conditions. Under suitable deposition conditions, EBID can be used as a localized technique for analysis of adsorption barriers and prefactors.

  18. Electron-beam lithography for micro and nano-optical applications

    NASA Technical Reports Server (NTRS)

    Wilson, Daniel W.; Muller, Richard E.; Echternach, Pierre M.

    2005-01-01

    Direct-write electron-beam lithography has proven to be a powerful technique for fabricating a variety of micro- and nano-optical devices. Binary E-beam lithography is the workhorse technique for fabricating optical devices that require complicated precision nano-scale features. We describe a bi-layer resist system and virtual-mark height measurement for improving the reliability of fabricating binary patterns. Analog E-beam lithography is a newer technique that has found significant application in the fabrication of diffractive optical elements. We describe our techniques for fabricating analog surface-relief profiles in E-beam resist, including some discussion regarding overcoming the problems of resist heating and charging. We also describe a multiple-field-size exposure scheme for suppression of field-stitch induced ghost diffraction orders produced by blazed diffraction gratings on non-flat substrates.

  19. Research Update: Focused ion beam direct writing of magnetic patterns with controlled structural and magnetic properties

    NASA Astrophysics Data System (ADS)

    Urbánek, Michal; Flajšman, Lukáš; Křižáková, Viola; Gloss, Jonáš; Horký, Michal; Schmid, Michael; Varga, Peter

    2018-06-01

    Focused ion beam irradiation of metastable Fe78Ni22 thin films grown on Cu(100) substrates is used to create ferromagnetic, body-centered cubic patterns embedded into paramagnetic, face-centered-cubic surrounding. The structural and magnetic phase transformation can be controlled by varying parameters of the transforming gallium ion beam. The focused ion beam parameters such as the ion dose, number of scans, and scanning direction can be used not only to control a degree of transformation but also to change the otherwise four-fold in-plane magnetic anisotropy into the uniaxial anisotropy along a specific crystallographic direction. This change is associated with a preferred growth of specific crystallographic domains. The possibility to create magnetic patterns with continuous magnetization transitions and at the same time to create patterns with periodical changes in magnetic anisotropy makes this system an ideal candidate for rapid prototyping of a large variety of nanostructured samples. Namely, spin-wave waveguides and magnonic crystals can be easily combined into complex devices in a single fabrication step.

  20. Next Generation Proton Beam Writing: A Platform Technology for Nanowire Integration

    DTIC Science & Technology

    2010-06-01

    Final Report AOARD 09-4020 Next Generation Proton Beam Writing: a platform technology for Nanowire Integration JA van Kan1, AA Bettiol1, T...PBW with a finely focused 2 MeV beam was used to write holes in a matrix of thick PMMA . A G-G developer was used to develop the PMMA patterns. The...solution. The deposition speed was about 1 μm of plated Au in every 5 min. When a sufficient thickness of Au had been deposited, the PMMA around the

  1. The Next Generation Focusing Lenses for Proton Beam Writing

    DTIC Science & Technology

    2009-07-28

    Final Report AOARD 07-4017 The Next Generation Focusing Lenses for Proton Beam Writing JA van Kan1, AA Bettiol1, T. Osipowicz2, MBH Breese3, and F...with a finely focused 2 MeV beam was used to write holes in a matrix of thick PMMA . A G-G developer was used to develop the PMMA patterns. The G-G...The deposition speed was about 1 μm of plated Au in every 5 min. When a sufficient thickness of Au had been deposited, the PMMA around the gold

  2. Single cell electroporation using proton beam fabricated biochips

    NASA Astrophysics Data System (ADS)

    Homhuan, S.; Zhang, B.; Sheu, F.-S.; Bettiol, A. A.; Watt, F.

    2010-05-01

    We report the design and fabrication of a novel single cell electroporation biochip fabricated by the Proton Beam Writing technique (PBW), a new technique capable of direct-writing high-aspect-ratio nano and microstructures. The biochip features nickel micro-electrodes with straight-side walls between which individual cells are positioned. By applying electrical impulses across the electrodes, SYTOX® Green nucleic acid stain is incorporated into mouse neuroblastoma (N2a) cells. When the stain binds with DNA inside the cell nucleus, green fluorescence is observed upon excitation from a halogen lamp. Three parameters; electric field strength, pulse duration, and the number of pulses have been considered and optimized for the single cell electroporation. The results show that our biochip gives successfully electroporated cells . This single cell electroporation system represents a promising method for investigating the introduction of a wide variety of fluorophores, nanoparticles, quantum dots, DNAs and proteins into cells.

  3. Time-resolved scanning Kerr microscopy of flux beam formation in hard disk write heads

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Valkass, Robert A. J., E-mail: rajv202@ex.ac.uk; Spicer, Timothy M.; Burgos Parra, Erick

    To meet growing data storage needs, the density of data stored on hard disk drives must increase. In pursuit of this aim, the magnetodynamics of the hard disk write head must be characterized and understood, particularly the process of “flux beaming.” In this study, seven different configurations of perpendicular magnetic recording (PMR) write heads were imaged using time-resolved scanning Kerr microscopy, revealing their detailed dynamic magnetic state during the write process. It was found that the precise position and number of driving coils can significantly alter the formation of flux beams during the write process. These results are applicable tomore » the design and understanding of current PMR and next-generation heat-assisted magnetic recording devices, as well as being relevant to other magnetic devices.« less

  4. Characterization of submillisecond response optical addressing phase modulator based on low light scattering polymer network liquid crystal

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Xiangjie, Zhao, E-mail: zxjdouble@163.com, E-mail: zxjdouble@gmail.com; Cangli, Liu; Jiazhu, Duan

    Optically addressed conventional nematic liquid crystal spatial light modulator has attracted wide research interests. But the slow response speed limited its further application. In this paper, polymer network liquid crystal (PNLC) was proposed to replace the conventional nematic liquid crystal to enhance the response time to the order of submillisecond. The maximum light scattering of the employed PNLC was suppressed to be less than 2% at 1.064 μm by optimizing polymerization conditions and selecting large viscosity liquid crystal as solvent. The occurrence of phase ripple phenomenon due to electron diffusion and drift in photoconductor was found to deteriorate the phase modulationmore » effect of the optical addressed PNLC phase modulator. The wavelength effect and AC voltage frequency effect on the on state dynamic response of phase change was investigated by experimental methods. These effects were interpreted by electron diffusion and drift theory based on the assumption that free electron was inhomogeneously distributed in accordance with the writing beam intensity distribution along the incident direction. The experimental results indicated that the phase ripple could be suppressed by optimizing the wavelength of the writing beam and the driving AC voltage frequency when varying the writing beam intensity to generate phase change in 2π range. The modulation transfer function was also measured.« less

  5. Ion implantation for deterministic single atom devices

    NASA Astrophysics Data System (ADS)

    Pacheco, J. L.; Singh, M.; Perry, D. L.; Wendt, J. R.; Ten Eyck, G.; Manginell, R. P.; Pluym, T.; Luhman, D. R.; Lilly, M. P.; Carroll, M. S.; Bielejec, E.

    2017-12-01

    We demonstrate a capability of deterministic doping at the single atom level using a combination of direct write focused ion beam and solid-state ion detectors. The focused ion beam system can position a single ion to within 35 nm of a targeted location and the detection system is sensitive to single low energy heavy ions. This platform can be used to deterministically fabricate single atom devices in materials where the nanostructure and ion detectors can be integrated, including donor-based qubits in Si and color centers in diamond.

  6. Beam propagation modeling of modified volume Fresnel zone plates fabricated by femtosecond laser direct writing.

    PubMed

    Srisungsitthisunti, Pornsak; Ersoy, Okan K; Xu, Xianfan

    2009-01-01

    Light diffraction by volume Fresnel zone plates (VFZPs) is simulated by the Hankel transform beam propagation method (Hankel BPM). The method utilizes circularly symmetric geometry and small step propagation to calculate the diffracted wave fields by VFZP layers. It is shown that fast and accurate diffraction results can be obtained with the Hankel BPM. The results show an excellent agreement with the scalar diffraction theory and the experimental results. The numerical method allows more comprehensive studies of the VFZP parameters to achieve higher diffraction efficiency.

  7. Ion implantation for deterministic single atom devices

    DOE PAGES

    Pacheco, J. L.; Singh, M.; Perry, D. L.; ...

    2017-12-04

    Here, we demonstrate a capability of deterministic doping at the single atom level using a combination of direct write focused ion beam and solid-state ion detectors. The focused ion beam system can position a single ion to within 35 nm of a targeted location and the detection system is sensitive to single low energy heavy ions. This platform can be used to deterministically fabricate single atom devices in materials where the nanostructure and ion detectors can be integrated, including donor-based qubits in Si and color centers in diamond.

  8. Parallel compression/decompression-based datapath architecture for multibeam mask writers

    NASA Astrophysics Data System (ADS)

    Chaudhary, Narendra; Savari, Serap A.

    2017-06-01

    Multibeam electron beam systems will be used in the future for mask writing and for complimentary lithography. The major challenges of the multibeam systems are in meeting throughput requirements and in handling the large data volumes associated with writing grayscale data on the wafer. In terms of future communications and computational requirements Amdahl's Law suggests that a simple increase of computation power and parallelism may not be a sustainable solution. We propose a parallel data compression algorithm to exploit the sparsity of mask data and a grayscale video-like representation of data. To improve the communication and computational efficiency of these systems at the write time we propose an alternate datapath architecture partly motivated by multibeam direct write lithography and partly motivated by the circuit testing literature, where parallel decompression reduces clock cycles. We explain a deflection plate architecture inspired by NuFlare Technology's multibeam mask writing system and how our datapath architecture can be easily added to it to improve performance.

  9. Parallel compression/decompression-based datapath architecture for multibeam mask writers

    NASA Astrophysics Data System (ADS)

    Chaudhary, Narendra; Savari, Serap A.

    2017-10-01

    Multibeam electron beam systems will be used in the future for mask writing and for complementary lithography. The major challenges of the multibeam systems are in meeting throughput requirements and in handling the large data volumes associated with writing grayscale data on the wafer. In terms of future communications and computational requirements, Amdahl's law suggests that a simple increase of computation power and parallelism may not be a sustainable solution. We propose a parallel data compression algorithm to exploit the sparsity of mask data and a grayscale video-like representation of data. To improve the communication and computational efficiency of these systems at the write time, we propose an alternate datapath architecture partly motivated by multibeam direct-write lithography and partly motivated by the circuit testing literature, where parallel decompression reduces clock cycles. We explain a deflection plate architecture inspired by NuFlare Technology's multibeam mask writing system and how our datapath architecture can be easily added to it to improve performance.

  10. Synthesis of metal nanoparticle and patterning in polymeric films induced by electron beam

    NASA Astrophysics Data System (ADS)

    Yamamoto, Hiroki; Kozawa, Takahiro; Tagawa, Seiichi; Marignier, Jean-Louis; Mostafavi, Mehran; Belloni, Jacqueline

    2018-03-01

    Using an electron beam, thin polymeric films loaded with metal nanoparticles of silver were prepared by a one-step irradiation-induced reduction of the metal ions embedded in the polymer. The metal nanoparticles were observed by either optical absorption or microscopy. The mechanism of the reduction of metal ions and of the polymer crosslinking were deduced from the average absorbance measurements. In view of realizing specific patterns of high resolution using the electron beam, electron beam produces 200 nm wide lines that can be separated by unexposed spaces of adjustable width, where precursors were dissolved. The resolution of the electron beam has been exploited to demonstrate the achievement of nanopatterning on polymer films using a direct-writing process. This method supplies interesting applications such as masks, replicas, or imprint molds of improved density and contrast.

  11. Direct laser written polymer waveguides with out of plane couplers for optical chips

    NASA Astrophysics Data System (ADS)

    Landowski, Alexander; Zepp, Dominik; Wingerter, Sebastian; von Freymann, Georg; Widera, Artur

    2017-10-01

    Optical technologies call for waveguide networks featuring high integration densities, low losses, and simple operation. Here, we present polymer waveguides fabricated from a negative tone photoresist via two-photon-lithography in direct laser writing, and show a detailed parameter study of their performance. Specifically, we produce waveguides featuring bend radii down to 40 μ m, insertion losses of the order of 10 dB, and loss coefficients smaller than 0.81 dB mm-1, facilitating high integration densities in writing fields of 300 μ m×300 μ m. A novel three-dimensional coupler design allows for coupling control as well as direct observation of outputs in a single field of view through a microscope objective. Finally, we present beam-splitting devices to construct larger optical networks, and we show that the waveguide material is compatible with the integration of quantum emitters.

  12. Direct metal writing: Controlling the rheology through microstructure

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Chen, Wen; Thornley, Luke; Coe, Hannah G.

    Most metal additive manufacturing approaches are based on powder-bed melting techniques such as laser selective melting or electron beam melting, which often yield uncontrolled microstructures with defects (e.g., pores or microcracks) and residual stresses. Here, we introduce a proof-of-concept prototype of a 3D metal freeform fabrication process by direct writing of metallic alloys in the semi-solid regime. This process is achieved through controlling the particular microstructure and the rheological behavior of semi-solid alloy slurries, which demonstrate a well suited viscosity and a shear thinning property to retain the shape upon printing. Furthermore, the ability to control the microstructure through thismore » method yields a flexible manufacturing route to fabricating 3D metal parts with full density and complex geometries.« less

  13. Direct metal writing: Controlling the rheology through microstructure

    DOE PAGES

    Chen, Wen; Thornley, Luke; Coe, Hannah G.; ...

    2017-02-27

    Most metal additive manufacturing approaches are based on powder-bed melting techniques such as laser selective melting or electron beam melting, which often yield uncontrolled microstructures with defects (e.g., pores or microcracks) and residual stresses. Here, we introduce a proof-of-concept prototype of a 3D metal freeform fabrication process by direct writing of metallic alloys in the semi-solid regime. This process is achieved through controlling the particular microstructure and the rheological behavior of semi-solid alloy slurries, which demonstrate a well suited viscosity and a shear thinning property to retain the shape upon printing. Furthermore, the ability to control the microstructure through thismore » method yields a flexible manufacturing route to fabricating 3D metal parts with full density and complex geometries.« less

  14. Marching of the microlithography horses: electron, ion, and photon: past, present, and future

    NASA Astrophysics Data System (ADS)

    Lin, Burn J.

    2007-03-01

    Microlithography patterning employs one of three media; electron, ion, and photon. They are in a way like horses, racing towards the mainstream. Some horses such as electrons run fast but repel each other. Ion beams behave like electron beams but are less developed. The photon beam is the undisputed workhorse, taking microlithography from the 5-μm minimum feature size to 32-nm half pitch. This paper examines the history of microlithography in pattern generation, proximity printing, and projection printing, then identifies the strong and weak points of each technology. In addition to ion-beam and e-beam lithography, the coverage of optical lithography spans the wavelength from 436 to 13.5 nm. Our learning from history helps us prevent mistakes in the future. In almost all cases, making or using the mask presents one of the limiting problems, no matter the type of beams or the replication method. Only the maskless method relieves us from mask-related problems. A way to overcome the low throughput handicap of maskless systems is to use multiple e-beam direct writing, whose imaging lens can be economically and compactly fabricated using MEMS techniques. In a way, the history of microlithography parallels that of aviation. Proximity printing is like the Wright-Brothers' plane; 1X projection printing, single-engine propeller plane with unitized body; reduction step-and-repeat projection printing, multi-engine commercial airliner; scanners, jet airliners. Optical lithography has improved in many ways than just increasing NA and reducing wavelength just as the commercial airliners improving in many other areas than just the speed. The SST increased the speed of airliners by more than a factor of two just as optical resolution doubled with double exposures. EUV lithography with the wavelength reduced by an order of magnitude is similar to the space shuttle increasing its speed to more than 10 times that of the SST. Multiple-beam direct write systems are like helicopters. They do not need airports(masks) but we need a lot of beams to carry the same payload.

  15. Lossless compression algorithm for REBL direct-write e-beam lithography system

    NASA Astrophysics Data System (ADS)

    Cramer, George; Liu, Hsin-I.; Zakhor, Avideh

    2010-03-01

    Future lithography systems must produce microchips with smaller feature sizes, while maintaining throughputs comparable to those of today's optical lithography systems. This places stringent constraints on the effective data throughput of any maskless lithography system. In recent years, we have developed a datapath architecture for direct-write lithography systems, and have shown that compression plays a key role in reducing throughput requirements of such systems. Our approach integrates a low complexity hardware-based decoder with the writers, in order to decompress a compressed data layer in real time on the fly. In doing so, we have developed a spectrum of lossless compression algorithms for integrated circuit layout data to provide a tradeoff between compression efficiency and hardware complexity, the latest of which is Block Golomb Context Copy Coding (Block GC3). In this paper, we present a modified version of Block GC3 called Block RGC3, specifically tailored to the REBL direct-write E-beam lithography system. Two characteristic features of the REBL system are a rotary stage resulting in arbitrarily-rotated layout imagery, and E-beam corrections prior to writing the data, both of which present significant challenges to lossless compression algorithms. Together, these effects reduce the effectiveness of both the copy and predict compression methods within Block GC3. Similar to Block GC3, our newly proposed technique Block RGC3, divides the image into a grid of two-dimensional "blocks" of pixels, each of which copies from a specified location in a history buffer of recently-decoded pixels. However, in Block RGC3 the number of possible copy locations is significantly increased, so as to allow repetition to be discovered along any angle of orientation, rather than horizontal or vertical. Also, by copying smaller groups of pixels at a time, repetition in layout patterns is easier to find and take advantage of. As a side effect, this increases the total number of copy locations to transmit; this is combated with an extra region-growing step, which enforces spatial coherence among neighboring copy locations, thereby improving compression efficiency. We characterize the performance of Block RGC3 in terms of compression efficiency and encoding complexity on a number of rotated Metal 1, Poly, and Via layouts at various angles, and show that Block RGC3 provides higher compression efficiency than existing lossless compression algorithms, including JPEG-LS, ZIP, BZIP2, and Block GC3.

  16. Flexible fabrication of multi-scale integrated 3D periodic nanostructures with phase mask

    NASA Astrophysics Data System (ADS)

    Yuan, Liang Leon

    Top-down fabrication of artificial nanostructures, especially three-dimensional (3D) periodic nanostructures, that forms uniform and defect-free structures over large area with the advantages of high throughput and rapid processing and in a manner that can further monolithically integrate into multi-scale and multi-functional devices is long-desired but remains a considerable challenge. This thesis study advances diffractive optical element (DOE) based 3D laser holographic nanofabrication of 3D periodic nanostructures and develops new kinds of DOEs for advanced diffracted-beam control during the fabrication. Phase masks, as one particular kind of DOE, are a promising direction for simple and rapid fabrication of 3D periodic nanostructures by means of Fresnel diffraction interference lithography. When incident with a coherent beam of light, a suitable phase mask (e.g. with 2D nano-grating) can create multiple diffraction orders that are inherently phase-locked and overlap to form a 3D light interference pattern in the proximity of the DOE. This light pattern is typically recorded in photosensitive materials including photoresist to develop into 3D photonic crystal nanostructure templates. Two kinds of advanced phase masks were developed that enable delicate phase control of multiple diffraction beams. The first exploits femtosecond laser direct writing inside fused silica to assemble multiple (up to nine) orthogonally crossed (2D) grating layers, spaced on Talbot planes to overcome the inherent weak diffraction efficiency otherwise found in low-contrast volume gratings. A systematic offsetting of orthogonal grating layers to establish phase offsets over 0 to pi/2 range provided precise means for controlling the 3D photonic crystal structure symmetry between body centered tetragonal (BCT) and woodpile-like tetragonal (wTTR). The second phase mask consisted of two-layered nanogratings with small sub-wavelength grating periods and phase offset control. That was designed with isotropic properties attractive for generating a complete photonic band gap (PBG). An isolation layer was used between adjacent polymer layers to offer a reversal coating for sample preparation of scanning electron microscopy (SEM) imaging and top surface planarization. Electron beam lithography has been employed to fabricate a multi-level nano-grating phase mask that produces a diamond-like 3D nanostructure via phase mask lithography, promising for creating photonic crystal (PC) templates that can be inverted with high-index materials and form a complete PBG at telecommunication wavelengths. A laser scanning holographic method for 3D exposure in thick photoresist is introduced that combines the unique advantages of large area 3D holographic interference lithography (HIL) with the flexible patterning of laser direct writing to form both micro- and nano-structures in a single exposure step. Phase mask interference patterns accumulated over multiple overlapping scans are shown to stitch seamlessly and form highly uniform 3D nanostructure with beam size scaled to small 200 microm diameter. Further direct-write holography demonstrates monolithical writing of multi-scale lab-on-a-chip with multiple functionalities including on-chip integrated fluorescence. Various 3D periodic nanostructures are demonstrated over a 15 mmx15 mm area, through full 40 microm photoresist thickness and with uniform structural and optical properties revealed by focused ion beam (FIB) milling, SEM imaging and stopband measures. The lateral and axial periods scale from respective 1500 nm to 570 nm and 9.2 microm to 1.2 microm to offer a Gamma-Z stopband at 1.5 microm. Overall, laser scanning is presented as a facile means to embed 3D PC nanostructure within microfluidic channels for integration into an optofluidic lab-on-chip, demonstrating a new laser HIL writing approach for creating multi-scale integrated microsystems.

  17. Formation of Silicon Nitride Structures by Direct Electron-Beam Writing.

    DTIC Science & Technology

    1982-02-01

    Urbana, Illinois 73 ii To My Very Own Sivvy ...We have come so far, it is over... from "Edge" by Sylvia Plath I p2" -,i ’- ’.’ . --’ -o . o...1 bellows custom fabricated from type 304 LN stainless steel, which is fully rated for cryogenic service. On the subject of service life , we should

  18. Local electric field direct writing – Electron-beam lithography and mechanism

    DOE PAGES

    Jiang, Nan; Su, Dong; Spence, John C. H.

    2017-08-24

    Local electric field induced by a focused electron probe in silicate glass thin films is evaluated in this paper by the migration of cations. Extremely strong local electric fields can be obtained by the focused electron probe from a scanning transmission electron microscope. As a result, collective atomic displacements occur. This newly revised mechanism provides an efficient tool to write patterned nanostructures directly, and thus overcome the low efficiency of the conventional electron-beam lithography. Applying this technique to silicate glass thin films, as an example, a grid of rods of nanometer dimension can be efficiently produced by rapidly scanning amore » focused electron probe. This nanopatterning is achieved through swift phase separation in the sample, without any post-development processes. The controlled phase separation is induced by massive displacements of cations (glass modifiers) within the glass-former network, driven by the strong local electric fields. The electric field is induced by accumulated charge within the electron probed region, which is generated by the excitation of atomic electrons by the incident electron. Throughput is much improved compared to other scanning probe techniques. Finally, the half-pitch spatial resolution of nanostructure in this particular specimen is 2.5 nm.« less

  19. Local electric field direct writing – Electron-beam lithography and mechanism

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Jiang, Nan; Su, Dong; Spence, John C. H.

    Local electric field induced by a focused electron probe in silicate glass thin films is evaluated in this paper by the migration of cations. Extremely strong local electric fields can be obtained by the focused electron probe from a scanning transmission electron microscope. As a result, collective atomic displacements occur. This newly revised mechanism provides an efficient tool to write patterned nanostructures directly, and thus overcome the low efficiency of the conventional electron-beam lithography. Applying this technique to silicate glass thin films, as an example, a grid of rods of nanometer dimension can be efficiently produced by rapidly scanning amore » focused electron probe. This nanopatterning is achieved through swift phase separation in the sample, without any post-development processes. The controlled phase separation is induced by massive displacements of cations (glass modifiers) within the glass-former network, driven by the strong local electric fields. The electric field is induced by accumulated charge within the electron probed region, which is generated by the excitation of atomic electrons by the incident electron. Throughput is much improved compared to other scanning probe techniques. Finally, the half-pitch spatial resolution of nanostructure in this particular specimen is 2.5 nm.« less

  20. E-beam direct write is free

    NASA Astrophysics Data System (ADS)

    Glasser, Lance A.

    2007-10-01

    In this paper we discuss four business concepts that will impact the adoption of e-beam direct write (EbDW). They are: (1) The economically advantageous region for EbDW. At what costs and volumes EbDW is economically advantageous is controlled by a two-sided constraint involving the cost of reticles on one hand and the cost of design on the other. (2) The important role of product derivatives and other markets that can be satisfied by designs with heavy IP reuse. The natural long tail in demand for differentiated products is today chopped off by the high costs of reticles. We show data on the elasticity of the product derivative market with respect to certain costs. (3) That because reticle prices typically decline at a 30% per year for the first few years after a new node is introduced, delaying the fabrication of that first reticle set for a new product can save millions, more than paying for EbDW. The applicability of this technique is, however, limited by the need for product requalifaction. (4) Finally, we introduce the business concept of the virtual reticle as a possible component in EbDW pricing.

  1. Interaction of doughnut-shaped laser pulses with glasses

    DOE PAGES

    Zhukov, Vladimir P.; Rubenchik, Alexander M.; Fedoruk, Mikhail P.; ...

    2017-01-26

    Non-Gaussian laser beams can open new opportunities for microfabrication, including ultrashort laser direct writing. By using a model based on Maxwell’s equations, we investigate the dynamics of doughnut-shaped laser beams focused inside fused silica glass, in comparison with Gaussian pulses of the same energy. The laser propagation dynamics reveals intriguing features of beam splitting and sudden collapse toward the beam axis, overcoming the intensity clamping effect. The resulting structure of light absorption represents a very hot, hollow nanocylinder, which can lead to an implosion process that brings matter to extreme thermodynamic states. Furthermore, by monitoring the simulations of the lasermore » beam scattering we see a considerable difference in both the blueshift and the angular distribution of scattered light for different laser energies, suggesting that investigations of the spectra of scattered radiation can be used as a diagnostic of laser-produced electron plasmas in transparent materials.« less

  2. Creation of diffraction-limited non-Airy multifocal arrays using a spatially shifted vortex beam

    NASA Astrophysics Data System (ADS)

    Lin, Han; Gu, Min

    2013-02-01

    Diffraction-limited non-Airy multifocal arrays are created by focusing a phase-modulated vortex beam through a high numerical-aperture objective. The modulated phase at the back aperture of the objective resulting from the superposition of two concentric phase-modulated vortex beams allows for the generation of a multifocal array of cylindrically polarized non-Airy patterns. Furthermore, we shift the spatial positions of the phase vortices to manipulate the intensity distribution at each focal spot, leading to the creation of a multifocal array of split-ring patterns. Our method is experimentally validated by generating the predicted phase modulation through a spatial light modulator. Consequently, the spatially shifted circularly polarized vortex beam adopted in a dynamic laser direct writing system facilitates the fabrication of a split-ring microstructure array in a polymer material by a single exposure of a femtosecond laser beam.

  3. Focus detection by shearing interference of vortex beams for non-imaging systems.

    PubMed

    Li, Xiongfeng; Zhan, Shichao; Liang, Yiyong

    2018-02-10

    In focus detection of non-imaging systems, the common image-based methods are not available. Also, interference techniques are seldom used because only the degree with hardly any direction of defocus can be derived from the fringe spacing. In this paper, we propose a vortex-beam-based shearing interference system to do focus detection for a focused laser direct-writing system, where a vortex beam is already involved. Both simulated and experimental results show that fork-like features are added in the interference patterns due to the existence of an optical vortex, which makes it possible to distinguish the degree and direction of defocus simultaneously. The theoretical fringe spacing and resolution of this method are derived. A resolution of 0.79 μm can be achieved under the experimental combination of parameters, and it can be further improved with the help of the image processing algorithm and closed-loop controlling in the future. Finally, the influence of incomplete collimation and the wedge angle of the shear plate is discussed. This focus detection approach is extremely appropriate for those non-imaging systems containing one or more focused vortex beams.

  4. Smart optical writing head design for laser-based manufacturing

    NASA Astrophysics Data System (ADS)

    Amin, M. Junaid; Riza, Nabeel A.

    2014-03-01

    Proposed is a smart optical writing head design suitable for high precision industrial laser based machining and manufacturing applications. The design uses an Electronically Controlled Variable Focus Lens (ECVFL) which enables the highest achievable spatial resolution of writing head spot sizes for axial target distances reaching 8 meters. A proof-of-concept experiment is conducted using a visible wavelength laser with a collimated beam that is coupled to beam conditioning optics which includes an electromagnetically actuated deformable membrane liquid ECVFL cascaded with a bias convex lens of fixed focal length. Electronic tuning and control of the ECVFL keeps the laser writing head far-field spot beam radii under 1 mm that is demonstrated over a target range of 20 cm to 800 cm. Applications for the proposed writing head design, which can accommodate both continuous wave and pulsed wave sources, include laser machining, high precision industrial molding of components, as well as materials processing requiring material sensitive optical power density control.

  5. Laser-assisted simultaneous transfer and patterning of vertically aligned carbon nanotube arrays on polymer substrates for flexible devices.

    PubMed

    In, Jung Bin; Lee, Daeho; Fornasiero, Francesco; Noy, Aleksandr; Grigoropoulos, Costas P

    2012-09-25

    We demonstrate a laser-assisted dry transfer technique for assembling patterns of vertically aligned carbon nanotube arrays on a flexible polymeric substrate. A laser beam is applied to the interface of a nanotube array and a polycarbonate sheet in contact with one another. The absorbed laser heat promotes nanotube adhesion to the polymer in the irradiated regions and enables selective pattern transfer. A combination of the thermal transfer mechanism with rapid direct writing capability of focused laser beam irradiation allows us to achieve simultaneous material transfer and direct micropatterning in a single processing step. Furthermore, we demonstrate that malleability of the nanotube arrays transferred onto a flexible substrate enables post-transfer tailoring of electric conductance by collapsing the aligned nanotubes in different directions. This work suggests that the laser-assisted transfer technique provides an efficient route to using vertically aligned nanotubes as conductive elements in flexible device applications.

  6. An optimized nanoparticle separator enabled by electron beam induced deposition

    NASA Astrophysics Data System (ADS)

    Fowlkes, J. D.; Doktycz, M. J.; Rack, P. D.

    2010-04-01

    Size-based separations technologies will inevitably benefit from advances in nanotechnology. Direct-write nanofabrication provides a useful mechanism for depositing/etching nanoscale elements in environments otherwise inaccessible to conventional nanofabrication techniques. Here, electron beam induced deposition was used to deposit an array of nanoscale features in a 3D environment with minimal material proximity effects outside the beam-interaction region. Specifically, the membrane component of a nanoparticle separator was fabricated by depositing a linear array of sharply tipped nanopillars, with a singular pitch, designed for sub-50 nm nanoparticle permeability. The nanopillar membrane was used in a dual capacity to control the flow of nanoparticles in the transaxial direction of the array while facilitating the sealing of the cellular-sized compartment in the paraxial direction. An optimized growth recipe resulted which (1) maximized the growth efficiency of the membrane (which minimizes proximity effects) and (2) preserved the fidelity of the spacing between nanopillars (which maximizes the size-based gating quality of the membrane) while (3) maintaining sharp nanopillar apexes for impaling an optically transparent polymeric lid critical for device sealing.

  7. Applications and requirements for MEMS scanner mirrors

    NASA Astrophysics Data System (ADS)

    Wolter, Alexander; Hsu, Shu-Ting; Schenk, Harald; Lakner, Hubert K.

    2005-01-01

    Micro scanning mirrors are quite versatile MEMS devices for the deflection of a laser beam or a shaped beam from another light source. The most exciting application is certainly in laser-scanned displays. Laser television, home cinema and data projectors will display the most brilliant colors exceeding even plasma, OLED and CRT. Devices for front and rear projection will have advantages in size, weight and price. These advantages will be even more important in near-eye virtual displays like head-mounted displays or viewfinders in digital cameras and potentially in UMTS handsets. Optical pattern generation by scanning a modulated beam over an area can be used also in a number of other applications: laser printers, direct writing of photo resist for printed circuit boards or laser marking and with higher laser power laser ablation or material processing. Scanning a continuous laser beam over a printed pattern and analyzing the scattered reflection is the principle of barcode reading in 1D and 2D. This principle works also for identification of signatures, coins, bank notes, vehicles and other objects. With a focused white-light or RGB beam even full color imaging with high resolution is possible from an amazingly small device. The form factor is also very interesting for the application in endoscopes. Further applications are light curtains for intrusion control and the generation of arbitrary line patterns for triangulation. Scanning a measurement beam extends point measurements to 1D or 2D scans. Automotive LIDAR (laser RADAR) or scanning confocal microscopy are just two examples. Last but not least there is the field of beam steering. E.g. for all-optical fiber switches or positioning of read-/write heads in optical storage devices. The variety of possible applications also brings a variety of specifications. This publication discusses various applications and their requirements.

  8. Writing time estimation of EB mask writer EBM-9000 for hp16nm/logic11nm node generation

    NASA Astrophysics Data System (ADS)

    Kamikubo, Takashi; Takekoshi, Hidekazu; Ogasawara, Munehiro; Yamada, Hirokazu; Hattori, Kiyoshi

    2014-10-01

    The scaling of semiconductor devices is slowing down because of the difficulty in establishing their functionality at the nano-size level and also because of the limitations in fabrications, mainly the delay of EUV lithography. While multigate devices (FinFET) are currently the main driver for scalability, other types of devices, such as 3D devices, are being realized to relax the scaling of the node. In lithography, double or multiple patterning using ArF immersion scanners is still a realistic solution offered for the hp16nm node fabrication. Other lithography candidates are those called NGL (Next Generation Lithography), such as DSA (Directed-Self-Assembling) or nanoimprint. In such situations, shot count for mask making by electron beam writers will not increase. Except for some layers, it is not increasing as previously predicted. On the other hand, there is another aspect that increases writing time. The exposure dose for mask writing is getting higher to meet tighter specifications of CD uniformity, in other words, reduce LER. To satisfy these requirements, a new electron beam mask writer, EBM-9000, has been developed for hp16nm/logic11nm generation. Electron optical system, which has the immersion lens system, was evolved from EBM-8000 to achieve higher current density of 800A/cm2. In this paper, recent shot count and dose trend are discussed. Also, writing time is estimated for the requirements in EBM-9000.

  9. Direct writing of micro/nano-scale patterns by means of particle lens arrays scanned by a focused diode pumped Nd:YVO4 laser

    NASA Astrophysics Data System (ADS)

    Pena, Ana; Wang, Zengbo; Whitehead, David; Li, Lin

    2010-11-01

    A practical approach to a well-known technique of laser micro/nano-patterning by optical near fields is presented. It is based on surface patterning by scanning a Gaussian laser beam through a self-assembled monolayer of silica micro-spheres on a single-crystalline silicon (Si) substrate. So far, the outcome of this kind of near-field patterning has been related to the simultaneous, parallel surface-structuring of large areas either by top hat or Gaussian laser intensity distributions. We attempt to explore the possibility of using the same technique in order to produce single, direct writing of features. This could be of advantage for applications in which only some areas need to be patterned (i.e. local area selective patterning) or single lines are required (e.g. a particular micro/nano-fluidic channel). A diode pumped Nd:YVO4 laser system (wavelength of 532 nm, pulse duration of 8 ns, repetition rate of 30 kHz) with a computer-controlled 3 axis galvanometer beam scanner was employed to write user-defined patterns through the particle lens array on the Si substrate. After laser irradiation, the obtained patterns which are in the micro-scale were composed of sub-micro/micro-holes or bumps. The micro-pattern resolution depends on the dimension of both the micro-sphere’s diameter and the beam’s spot size. The developed technique could potentially be employed to fabricate photonic crystal structures mimicking nature’s butterfly wings and anti-reflective “moth eye” arrays for photovoltaic cells.

  10. Refractive index change mechanisms in different glasses induced by femtosecond laser irradiation

    NASA Astrophysics Data System (ADS)

    Fuerbach, A.; Gross, S.; Little, D.; Arriola, A.; Ams, M.; Dekker, P.; Withford, M.

    2016-07-01

    Tightly focused femtosecond laser pulses can be used to alter the refractive index of virtually all optical glasses. As the laser-induced modification is spatially limited to the focal volume of the writing beam, this technique enables the fabrication of fully three-dimensional photonic structures and devices that are automatically embedded within the host material. While it is well understood that the laser-material interaction process is initiated by nonlinear, typically multiphoton absorption, the actual mechanism that results in an increase or sometimes decrease of the refractive index of the glass strongly depends on the composition of the material and the process parameters and is still subject to scientific studies. In this paper, we present an overview of our recent work aimed at uncovering the physical and chemical processes that contribute to the observed material modification. Raman microscopy and electron microprobe analysis was used to study the induced modifications that occur within the glass matrix and the influence of atomic species migration forced by the femtosecond laser writing beam. In particular, we concentrate on borosilicate, heavy metal fluoride and phosphate glasses. We believe that our results represent an important step towards the development of engineered glass types that are ideally suited for the fabrication of photonic devices via the femtosecond laser direct write technique.

  11. Optical lattice-like cladding waveguides by direct laser writing: fabrication, luminescence, and lasing.

    PubMed

    Nie, Weijie; He, Ruiyun; Cheng, Chen; Rocha, Uéslen; Rodríguez Vázquez de Aldana, Javier; Jaque, Daniel; Chen, Feng

    2016-05-15

    We report on the fabrication of optical lattice-like waveguide structures in an Nd:YAP laser crystal by using direct femtosecond laser writing. With periodically arrayed laser-induced tracks, the waveguiding cores can be located in either the regions between the neighbored tracks or the central zone surrounded by a number of tracks as outer cladding. The polarization of the femtosecond laser pulses for the inscription has been found to play a critical role in the anisotropic guiding behaviors of the structures. The confocal photoluminescence investigations reveal different stress-induced modifications of the structures inscribed by different polarization of the femtosecond laser beam, which are considered to be responsible for the refractive index changes of the structures. Under optical pump at 808 nm, efficient waveguide lasing at ∼1  μm wavelength has been realized from the optical lattice-like structure, which exhibits potential applications as novel miniature light sources.

  12. Laser printed nano-gratings: orientation and period peculiarities

    NASA Astrophysics Data System (ADS)

    Stankevič, Valdemar; Račiukaitis, Gediminas; Bragheri, Francesca; Wang, Xuewen; Gamaly, Eugene G.; Osellame, Roberto; Juodkazis, Saulius

    2017-01-01

    Understanding of material behaviour at nanoscale under intense laser excitation is becoming critical for future application of nanotechnologies. Nanograting formation by linearly polarised ultra-short laser pulses has been studied systematically in fused silica for various pulse energies at 3D laser printing/writing conditions, typically used for the industrial fabrication of optical elements. The period of the nanogratings revealed a dependence on the orientation of the scanning direction. A tilt of the nanograting wave vector at a fixed laser polarisation was also observed. The mechanism responsible for this peculiar dependency of several features of the nanogratings on the writing direction is qualitatively explained by considering the heat transport flux in the presence of a linearly polarised electric field, rather than by temporal and spatial chirp of the laser beam. The confirmed vectorial nature of the light-matter interaction opens new control of material processing with nanoscale precision.

  13. Quantum point contacts for electrons on H-Si(111) surfaces using a Ga focused-ion beam for direct-write implant lithography

    NASA Astrophysics Data System (ADS)

    Robertson, Luke D.; Kane, B. E.

    Quantum point contacts (QPCs) realized in materials with anisotropic electron mass, such as Si, may exhibit valley filter phenomena leading to extreme sensitivity to single donor occupancy, and thus are of interest to measurement schemes for donor-based quantum information processing. To this end, we have developed ambipolar devices on a H-Si(111):Si(100)/SiO2 flip-chip assembly which utilize in-plane, degenerately doped n+ (P) and p+ (B) contacts to probe transport in a 2D electron system (2DES). In addition to providing electrostatic isolation of carriers, these p-type contacts can be used as lateral depletion gates to modulate the 2DES conductance, and if extended to the nanoscale can lead to 1D confinement and quantized conductance of the 2DES. In this talk, I will describe our efforts to use a Ga focused-ion beam for direct-write implant lithography to pattern QPCs and Ga nanowires on H-Si(111) surfaces. I will present low temperature (4.2K) conductance data collected on 30nm Ga nanowires to demonstrate their effectiveness as lateral depletion gates, and discuss on going measurements to confine and modulate the conductance of the 2DES using Ga QPCs.

  14. Multiple orbital angular momentum generated by dielectric hybrid phase element

    NASA Astrophysics Data System (ADS)

    Wang, Xuewen; Kuchmizhak, Aleksandr; Hu, Dejiao; Li, Xiangping

    2017-09-01

    Vortex beam carrying multiple orbital angular momentum provides a new degree of freedom to manipulate light leading to the various exciting applications as trapping, quantum optics, information multiplexing, etc. Helical wavefront can be generated either via the geometric or the dynamic phase arising from a space-variant birefringence (q-plate) or from phase accumulation through propagation (spiral-phase-plate), respectively. Using fast direct laser writing technique we fabricate and characterize novel hybrid q-plate generating vortex beam simultaneously carrying two different high-order topological charges, which arise from the spin-orbital conversion and the azimuthal height variation of the recorded structures. We approve the versatile concept to generate multiple-OAM vortex beams combining the spin-orbital interaction and the phase accumulation in a single micro-scale device, a hybrid dielectric phase plate.

  15. Investigating nonlinear distortion in the photopolymer materials

    NASA Astrophysics Data System (ADS)

    Malallah, Ra'ed; Cassidy, Derek; Muniraj, Inbarasan; Zhao, Liang; Ryle, James P.; Sheridan, John T.

    2017-05-01

    Propagation and diffraction of a light beam through nonlinear materials are effectively compensated by the effect of selftrapping. The laser beam propagating through photo-sensitive polymer PVA/AA can generate a waveguide of higher refractive index in direction of the light propagation. In order to investigate this phenomenon occurring in light-sensitive photopolymer media, the behaviour of a single light beam focused on the front surface of photopolymer bulk is investigated. As part of this work the self-bending of parallel beams separated in spaces during self-writing waveguides are studied. It is shown that there is strong correlation between the intensity of the input beams and their separation distance and the resulting deformation of waveguide trajectory during channels formation. This self-channeling can be modelled numerically using a three-dimension model to describe what takes place inside the volume of a photopolymer media. Corresponding numerical simulations show good agreement with experimental observations, which confirm the validity of the numerical model that was used to simulate these experiments.

  16. Proton-beam writing channel based on an electrostatic accelerator

    NASA Astrophysics Data System (ADS)

    Lapin, A. S.; Rebrov, V. A.; Kolin'ko, S. V.; Salivon, V. F.; Ponomarev, A. G.

    2016-09-01

    We have described the structure of the proton-beam writing channel as a continuation of a nuclear scanning microprobe channel. The problem of the accuracy of positioning a probe by constructing a new high-frequency electrostatic scanning system has been solved. Special attention has been paid to designing the probe-forming system and its various configurations have been considered. The probe-forming system that best corresponds to the conditions of the lithographic process has been found based on solving the problem of optimizing proton beam formation. A system for controlling beam scanning using multifunctional module of integrated programmable logic systems has been developed.

  17. Laser-guided direct writing for three-dimensional tissue engineering: Analysis and application of radiation forces

    NASA Astrophysics Data System (ADS)

    Nahmias, Yaakov Koby

    Tissue Engineering aims for the creation of functional tissues or organs using a combination of biomaterials and living cells. Artificial tissues can be implanted in patients to restore tissue function that was lost due to trauma, disease, or genetic disorder. Tissue equivalents may also be used to screen the effects of drugs and toxins, reducing the use of animals in research. One of the principle limitations to the size of engineered tissue is oxygen and nutrient transport. Lacking their own vascular bed, cells embedded in the engineered tissue will consume all available oxygen within hours while out branching blood vessels will take days to vascularize the implanted tissue. Establishing capillaries within the tissue prior to implantation can potentially eliminate this limitation. One approach to establishing capillaries within the tissue is to directly write endothelial cells with micrometer accuracy as it is being built. The patterned endothelial cells will then self-assemble into vascular structures within the engineering tissue. The cell patterning technique known as laser-guided direct writing can confine multiple cells in a laser beam and deposit them as a steady stream on any non-absorbing surface with micrometer scale accuracy. By applying the generalized Lorenz-Mie theory for light scattering on laser-guided direct writing we were able to accurately predict the behavior of with various cells and particles in the focused laser. In addition, two dimensionless parameters were identified for general radiation-force based system design. Using laser-guided direct writing we were able to direct the assembly of endothelial vascular structures with micrometer accuracy in two and three dimensions. The patterned vascular structures provided the backbone for subsequent in vitro liver morphogenesis. Our studies show that hepatocytes migrate toward and adhere to endothelial vascular structures in response to endothelial-secreted hepatocyte growth factor (HGF). Our approach has the advantage of retaining the natural heterotypic cell-cell interaction and spatial arrangement of native tissue, which is important for proper tissue function.* *This dissertation is a compound document (contains both a paper copy and a CD as part of the dissertation). The CD requires the following system requirements: Microsoft Office; Windows MediaPlayer or RealPlayer.

  18. SERODS optical data storage with parallel signal transfer

    DOEpatents

    Vo-Dinh, Tuan

    2003-09-02

    Surface-enhanced Raman optical data storage (SERODS) systems having increased reading and writing speeds, that is, increased data transfer rates, are disclosed. In the various SERODS read and write systems, the surface-enhanced Raman scattering (SERS) data is written and read using a two-dimensional process called parallel signal transfer (PST). The various embodiments utilize laser light beam excitation of the SERODS medium, optical filtering, beam imaging, and two-dimensional light detection. Two- and three-dimensional SERODS media are utilized. The SERODS write systems employ either a different laser or a different level of laser power.

  19. SERODS optical data storage with parallel signal transfer

    DOEpatents

    Vo-Dinh, Tuan

    2003-06-24

    Surface-enhanced Raman optical data storage (SERODS) systems having increased reading and writing speeds, that is, increased data transfer rates, are disclosed. In the various SERODS read and write systems, the surface-enhanced Raman scattering (SERS) data is written and read using a two-dimensional process called parallel signal transfer (PST). The various embodiments utilize laser light beam excitation of the SERODS medium, optical filtering, beam imaging, and two-dimensional light detection. Two- and three-dimensional SERODS media are utilized. The SERODS write systems employ either a different laser or a different level of laser power.

  20. Resist heating effect on e-beam mask writing at 75 kV and 60 A/cm2

    NASA Astrophysics Data System (ADS)

    Benes, Zdenek; Deverich, Christina; Huang, Chester; Lawliss, Mark

    2003-12-01

    Resist heating has been known to be one of the main contributors to local CD variation in mask patterning using variable shape e-beam tools. Increasingly complex mask patterns require increased number of shapes which drives the need for higher electron beam current densities to maintain reasonable write times. As beam current density is increased, CD error resulting from resist heating may become a dominating contributor to local CD variations. In this experimental study, the IBM EL4+ mask writer with high voltage and high current density has been used to quantitatively investigate the effect of resist heating on the local CD uniformity. ZEP 7000 and several chemically amplified resists have been evaluated under various exposure conditions (single-pass, multi-pass, variable spot size) and pattern densities. Patterns were designed specifically to allow easy measurement of local CD variations with write strategies designed to maximize the effect of resist heating. Local CD variations as high as 15 nm in 18.75 × 18.75 μm sub-field size have been observed for ZEP 7000 in a single-pass writing with full 1000 nm spots at 50% pattern density. This number can be reduced by increasing the number of passes or by decreasing the maximum spot size. The local CD variation has been reduced to as low as 2 nm for ZEP 7000 for the same pattern under modified exposure conditions. The effectiveness of various writing strategies is discussed as well as their possible deficiencies. Minimal or no resist heating effects have been observed for the chemically amplified resists studied. The results suggest that the resist heating effect can be well controlled by careful selection of the resist/process system and/or writing strategy and that resist heating does not have to pose a problem for high throughput e-beam mask making that requires high voltage and high current densities.

  1. Nanofabrication with a helium ion microscope

    NASA Astrophysics Data System (ADS)

    Maas, Diederik; van Veldhoven, Emile; Chen, Ping; Sidorkin, Vadim; Salemink, Huub; van der Drift, Emile..; Alkemade, Paul

    2010-03-01

    The recently introduced helium ion microscope (HIM) is capable of imaging and fabrication of nanostructures thanks to its sub-nanometer sized ion probe. The unique interaction of the helium ions with the sample material provides very localized secondary electron emission, thus providing a valuable signal for high-resolution imaging as well as a mechanism for very precise nanofabrication. The low proximity effects, due to the low yield of backscattered ions and the confinement of the forward scattered ions into a narrow cone, enable patterning of ultra-dense sub-10 nm structures. This paper presents various nanofabrication results obtained with direct-write, with scanning helium ion beam lithography, and with helium ion beam induced deposition.

  2. Simulation-Guided 3D Nanomanufacturing via Focused Electron Beam Induced Deposition

    DOE PAGES

    Fowlkes, Jason D.; Winkler, Robert; Lewis, Brett B.; ...

    2016-06-10

    Focused electron beam induced deposition (FEBID) is one of the few techniques that enables direct-write synthesis of free-standing 3D nanostructures. While the fabrication of simple architectures such as vertical or curving nanowires has been achieved by simple trial and error, processing complex 3D structures is not tractable with this approach. This is due, inpart, to the dynamic interplay between electron–solid interactions and the transient spatial distribution of absorbed precursor molecules on the solid surface. Here, we demonstrate the ability to controllably deposit 3D lattice structures at the micro/nanoscale, which have received recent interest owing to superior mechanical and optical properties.more » Moreover, a hybrid Monte Carlo–continuum simulation is briefly overviewed, and subsequently FEBID experiments and simulations are directly compared. Finally, a 3D computer-aided design (CAD) program is introduced, which generates the beam parameters necessary for FEBID by both simulation and experiment. In using this approach, we demonstrate the fabrication of various 3D lattice structures using Pt-, Au-, and W-based precursors.« less

  3. Proton beam writing of long, arbitrary structures for micro/nano photonics and fluidics applications

    NASA Astrophysics Data System (ADS)

    Udalagama, Chammika; Teo, E. J.; Chan, S. F.; Kumar, V. S.; Bettiol, A. A.; Watt, F.

    2011-10-01

    The last decade has seen proton beam writing maturing into a versatile lithographic technique able to produce sub-100 nm, high aspect ratio structures with smooth side walls. However, many applications in the fields of photonics and fluidics require the fabrication of structures with high spatial resolution that extends over several centimetres. This cannot be achieved by purely magnetic or electrostatic beam scanning due to the large off-axis beam aberrations in high demagnification systems. As a result, this has limited us to producing long straight structures using a combination of beam and stage scanning. In this work we have: (1) developed an algorithm to include any arbitrary pattern into the writing process by using a more versatile combination of beam and stage scanning while (2) incorporating the use of the ubiquitous AutoCAD DXF (drawing exchange format) into the design process. We demonstrate the capability of this approach in fabricating structures such as Y-splitters, Mach-Zehnder modulators and microfluidic channels that are over several centimetres in length, in polymer. We also present optimisation of such parameters as scanning speed and scanning loops to improve on the surface roughness of the structures. This work opens up new possibilities of using CAD software in PBW for microphotonics and fluidics device fabrication.

  4. Matrices pattern using FIB; 'Out-of-the-box' way of thinking.

    PubMed

    Fleger, Y; Gotlib-Vainshtein, K; Talyosef, Y

    2017-03-01

    Focused ion beam (FIB) is an extremely valuable tool in nanopatterning and nanofabrication for potentially high-resolution patterning, especially when refers to He ion beam microscopy. The work presented here demonstrates an 'out-of-the-box' method of writing using FIB, which enables creating very large matrices, up to the beam-shift limitation, in short times and with high accuracy unachievable by any other writing technique. The new method allows combining different shapes in nanometric dimensions and high resolutions for wide ranges. © 2017 The Authors Journal of Microscopy © 2017 Royal Microscopical Society.

  5. Independent control of beam astigmatism and ellipticity using a SLM for fs-laser waveguide writing.

    PubMed

    Ruiz de la Cruz, A; Ferrer, A; Gawelda, W; Puerto, D; Sosa, M Galván; Siegel, J; Solis, J

    2009-11-09

    We have used a low repetition rate (1 kHz), femtosecond laser amplifier in combination with a spatial light modulator (SLM) to write optical waveguides with controllable cross-section inside a phosphate glass sample. The SLM is used to induce a controllable amount of astigmatism in the beam wavefront while the beam ellipticity is controlled through the propagation distance from the SLM to the focusing optics of the writing set-up. The beam astigmatism leads to the formation of two separate disk-shaped foci lying in orthogonal planes. Additionally, the ellipticity has the effect of enabling control over the relative peak irradiances of the two foci, making it possible to bring the peak irradiance of one of them below the material transformation threshold. This allows producing a single waveguide with controllable cross-section. Numerical simulations of the irradiance distribution at the focal region under different beam shaping conditions are compared to in situ obtained experimental plasma emission images and structures produced inside the glass, leading to a very satisfactory agreement. Finally, guiding structures with controllable cross-section are successfully produced in the phosphate glass using this approach.

  6. Suppressing Ghost Diffraction in E-Beam-Written Gratings

    NASA Technical Reports Server (NTRS)

    Wilson, Daniel; Backlund, Johan

    2009-01-01

    A modified scheme for electron-beam (E-beam) writing used in the fabrication of convex or concave diffraction gratings makes it possible to suppress the ghost diffraction heretofore exhibited by such gratings. Ghost diffraction is a spurious component of diffraction caused by a spurious component of grating periodicity as described below. The ghost diffraction orders appear between the main diffraction orders and are typically more intense than is the diffuse scattering from the grating. At such high intensity, ghost diffraction is the dominant source of degradation of grating performance. The pattern of a convex or concave grating is established by electron-beam writing in a resist material coating a substrate that has the desired convex or concave shape. Unfortunately, as a result of the characteristics of electrostatic deflectors used to control the electron beam, it is possible to expose only a small field - typically between 0.5 and 1.0 mm wide - at a given fixed position of the electron gun relative to the substrate. To make a grating larger than the field size, it is necessary to move the substrate to make it possible to write fields centered at different positions, so that the larger area is synthesized by "stitching" the exposed fields.

  7. The range and intensity of backscattered electrons for use in the creation of high fidelity electron beam lithography patterns.

    PubMed

    Czaplewski, David A; Holt, Martin V; Ocola, Leonidas E

    2013-08-02

    We present a set of universal curves that predict the range and intensity of backscattered electrons which can be used in conjunction with electron beam lithography to create high fidelity nanoscale patterns. The experimental method combines direct write dose, backscattered dose, and a self-reinforcing pattern geometry to measure the dose provided by backscattered electrons to a nanoscale volume on the substrate surface at various distances from the electron source. Electron beam lithography is used to precisely control the number and position of incident electrons on the surface of the material. Atomic force microscopy is used to measure the height of the negative electron beam lithography resist. Our data shows that the range and the intensity of backscattered electrons can be predicted using the density and the atomic number of any solid material, respectively. The data agrees with two independent Monte Carlo simulations without any fitting parameters. These measurements are the most accurate electron range measurements to date.

  8. Monolithic crystalline cladding microstructures for efficient light guiding and beam manipulation in passive and active regimes.

    PubMed

    Jia, Yuechen; Cheng, Chen; Vázquez de Aldana, Javier R; Castillo, Gabriel R; Rabes, Blanca del Rosal; Tan, Yang; Jaque, Daniel; Chen, Feng

    2014-08-07

    Miniature laser sources with on-demand beam features are desirable devices for a broad range of photonic applications. Lasing based on direct-pump of miniaturized waveguiding active structures offers a low-cost but intriguing solution for compact light-emitting devices. In this work, we demonstrate a novel family of three dimensional (3D) photonic microstructures monolithically integrated in a Nd:YAG laser crystal wafer. They are produced by the femtosecond laser writing, capable of simultaneous light waveguiding and beam manipulation. In these guiding systems, tailoring of laser modes by both passive/active beam splitting and ring-shaped transformation are achieved by an appropriate design of refractive index patterns. Integration of graphene thin-layer as saturable absorber in the 3D laser structures allows for efficient passive Q-switching of tailored laser radiations which may enable miniature waveguiding lasers for broader applications. Our results pave a way to construct complex integrated passive and active laser circuits in dielectric crystals by using femtosecond laser written monolithic photonic chips.

  9. Comparison of technologies for nano device prototyping with a special focus on ion beams: A review

    NASA Astrophysics Data System (ADS)

    Bruchhaus, L.; Mazarov, P.; Bischoff, L.; Gierak, J.; Wieck, A. D.; Hövel, H.

    2017-03-01

    Nano device prototyping (NDP) is essential for realizing and assessing ideas as well as theories in the form of nano devices, before they can be made available in or as commercial products. In this review, application results patterned similarly to those in the semiconductor industry (for cell phone, computer processors, or memory) will be presented. For NDP, some requirements are different: thus, other technologies are employed. Currently, in NDP, for many applications direct write Gaussian vector scan electron beam lithography (EBL) is used to define the required features in organic resists on this scale. We will take a look at many application results carried out by EBL, self-organized 3D epitaxy, atomic probe microscopy (scanning tunneling microscope/atomic force microscope), and in more detail ion beam techniques. For ion beam techniques, there is a special focus on those based upon liquid metal (alloy) ion sources, as recent developments have significantly increased their applicability for NDP.

  10. Sub-wavelength Laser Nanopatterning using Droplet Lenses

    NASA Astrophysics Data System (ADS)

    Duocastella, Martí; Florian, Camilo; Serra, Pere; Diaspro, Alberto

    2015-11-01

    When a drop of liquid falls onto a screen, e.g. a cell phone, the pixels lying underneath appear magnified. This lensing effect is a combination of the curvature and refractive index of the liquid droplet. Here, the spontaneous formation of such lenses is exploited to overcome the diffraction limit of a conventional laser direct-writing system. In particular, micro-droplets are first laser-printed at user-defined locations on a surface and they are later used as lenses to focus the same laser beam. Under conditions described herein, nanopatterns can be obtained with a reduction in spot size primarily limited by the refractive index of the liquid. This all-optics approach is demonstrated by writing arbitrary patterns with a feature size around 280 nm, about one fourth of the processing wavelength.

  11. Sub-micrometre accurate free-form optics by three-dimensional printing on single-mode fibres

    PubMed Central

    Gissibl, Timo; Thiele, Simon; Herkommer, Alois; Giessen, Harald

    2016-01-01

    Micro-optics are widely used in numerous applications, such as beam shaping, collimation, focusing and imaging. We use femtosecond 3D printing to manufacture free-form micro-optical elements. Our method gives sub-micrometre accuracy so that direct manufacturing even on single-mode fibres is possible. We demonstrate the potential of our method by writing different collimation optics, toric lenses, free-form surfaces with polynomials of up to 10th order for intensity beam shaping, as well as chiral photonic crystals for circular polarization filtering, all aligned onto the core of the single-mode fibres. We determine the accuracy of our optics by analysing the output patterns as well as interferometrically characterizing the surfaces. We find excellent agreement with numerical calculations. 3D printing of microoptics can achieve sufficient performance that will allow for rapid prototyping and production of beam-shaping and imaging devices. PMID:27339700

  12. Pulsed Laser-Assisted Focused Electron-Beam-Induced Etching of Titanium with XeF 2 : Enhanced Reaction Rate and Precursor Transport

    DOE PAGES

    Noh, J. H.; Fowlkes, J. D.; Timilsina, R.; ...

    2015-01-28

    We introduce a laser-assisted focused electron-beam-induced etching (LA-FEBIE) process which is a versatile, direct write nanofabrication method that allows nanoscale patterning and editing; we do this in order to enhance the etch rate of electron-beam-induced etching. The results demonstrate that the titanium electron stimulated etch rate via the XeF2 precursor can be enhanced up to a factor of 6 times with an intermittent pulsed laser assist. Moreover, the evolution of the etching process is correlated to in situ stage current measurements and scanning electron micrographs as a function of time. Finally, the increased etch rate is attributed to photothermally enhancedmore » Ti–F reaction and TiF4 desorption and in some regimes enhanced XeF2 surface diffusion to the reaction zone.« less

  13. Sub-micrometre accurate free-form optics by three-dimensional printing on single-mode fibres.

    PubMed

    Gissibl, Timo; Thiele, Simon; Herkommer, Alois; Giessen, Harald

    2016-06-24

    Micro-optics are widely used in numerous applications, such as beam shaping, collimation, focusing and imaging. We use femtosecond 3D printing to manufacture free-form micro-optical elements. Our method gives sub-micrometre accuracy so that direct manufacturing even on single-mode fibres is possible. We demonstrate the potential of our method by writing different collimation optics, toric lenses, free-form surfaces with polynomials of up to 10th order for intensity beam shaping, as well as chiral photonic crystals for circular polarization filtering, all aligned onto the core of the single-mode fibres. We determine the accuracy of our optics by analysing the output patterns as well as interferometrically characterizing the surfaces. We find excellent agreement with numerical calculations. 3D printing of microoptics can achieve sufficient performance that will allow for rapid prototyping and production of beam-shaping and imaging devices.

  14. Low-dose patterning of platinum nanoclusters on carbon nanotubes by focused-electron-beam-induced deposition as studied by TEM

    PubMed Central

    Bittencourt, Carla; Bals, Sara; Van Tendeloo, Gustaaf

    2013-01-01

    Summary Focused-electron-beam-induced deposition (FEBID) is used as a direct-write approach to decorate ultrasmall Pt nanoclusters on carbon nanotubes at selected sites in a straightforward maskless manner. The as-deposited nanostructures are studied by transmission electron microscopy (TEM) in 2D and 3D, demonstrating that the Pt nanoclusters are well-dispersed, covering the selected areas of the CNT surface completely. The ability of FEBID to graft nanoclusters on multiple sides, through an electron-transparent target within one step, is unique as a physical deposition method. Using high-resolution TEM we have shown that the CNT structure can be well preserved thanks to the low dose used in FEBID. By tuning the electron-beam parameters, the density and distribution of the nanoclusters can be controlled. The purity of as-deposited nanoclusters can be improved by low-energy electron irradiation at room temperature. PMID:23399584

  15. Sub-micrometre accurate free-form optics by three-dimensional printing on single-mode fibres

    NASA Astrophysics Data System (ADS)

    Gissibl, Timo; Thiele, Simon; Herkommer, Alois; Giessen, Harald

    2016-06-01

    Micro-optics are widely used in numerous applications, such as beam shaping, collimation, focusing and imaging. We use femtosecond 3D printing to manufacture free-form micro-optical elements. Our method gives sub-micrometre accuracy so that direct manufacturing even on single-mode fibres is possible. We demonstrate the potential of our method by writing different collimation optics, toric lenses, free-form surfaces with polynomials of up to 10th order for intensity beam shaping, as well as chiral photonic crystals for circular polarization filtering, all aligned onto the core of the single-mode fibres. We determine the accuracy of our optics by analysing the output patterns as well as interferometrically characterizing the surfaces. We find excellent agreement with numerical calculations. 3D printing of microoptics can achieve sufficient performance that will allow for rapid prototyping and production of beam-shaping and imaging devices.

  16. Holographic memory using beam steering

    NASA Technical Reports Server (NTRS)

    Chao, Tien-Hsin (Inventor); Hanan, Jay C. (Inventor); Reyes, George F. (Inventor); Zhou, Hanying (Inventor)

    2007-01-01

    A method, apparatus, and system provide the ability for storing holograms at high speed. A single laser diode emits a collimated laser beam to both write to and read from a photorefractice crystal. One or more liquid crystal beam steering spatial light modulators (BSSLMs) steer a reference beam, split from the collimated laser beam, at high speed to the photorefractive crystal.

  17. Resolution performance of a 0.60-NA, 364-nm laser direct writer

    NASA Astrophysics Data System (ADS)

    Allen, Paul C.; Buck, Peter D.

    1990-06-01

    ATEQ has developed a high resolution laser scanning printing engine based on the 8 beam architecture of the CORE- 2000. This printing engine has been incorporated into two systems: the CORE-2500 for the production of advanced masks and reticles and a prototype system for direct write on wafers. The laser direct writer incorporates a through-the-lens alignment system and a rotary chuck for theta alignment. Its resolution performance is delivered by a 0. 60 NA laser scan lens and a novel air-jet focus system. The short focal length high resolution lens also reduces beam position errors thereby improving overall pattern accuracy. In order to take advantage of the high NA optics a high performance focus servo was developed capable of dynamic focus with a maximum error of 0. 15 tm. The focus system uses a hot wire anemometer to measure air flow through an orifice abutting the wafer providing a direct measurement to the top surface of resist independent of substrate properties. Lens specifications are presented and compared with the previous design. Bench data of spot size vs. entrance pupil filling show spot size performance down to 0. 35 m FWHM. The lens has a linearity specification of 0. 05 m system measurements of lens linearity indicate system performance substantially below this. The aerial image of the scanned beams is measured using resist as a threshold detector. An effective spot size is

  18. Multi-port, optically addressed RAM

    NASA Technical Reports Server (NTRS)

    Johnston, Alan R. (Inventor); Nixon, Robert H. (Inventor); Bergman, Larry A. (Inventor); Esener, Sadik (Inventor)

    1989-01-01

    A random access memory addressing system utilizing optical links between memory and the read/write logic circuits comprises addressing circuits including a plurality of light signal sources, a plurality of optical gates including optical detectors associated with the memory cells, and a holographic optical element adapted to reflect and direct the light signals to the desired memory cell locations. More particularly, it is a multi-port, binary computer memory for interfacing with a plurality of computers. There are a plurality of storage cells for containing bits of binary information, the storage cells being disposed at the intersections of a plurality of row conductors and a plurality of column conductors. There is interfacing logic for receiving information from the computers directing access to ones of the storage cells. There are first light sources associated with the interfacing logic for transmitting a first light beam with the access information modulated thereon. First light detectors are associated with the storage cells for receiving the first light beam, for generating an electrical signal containing the access information, and for conducting the electrical signal to the one of the storage cells to which it is directed. There are holographic optical elements for reflecting the first light beam from the first light sources to the first light detectors.

  19. Optimization of laser energy deposition for single-shot high aspect-ratio microstructuring of thick BK7 glass

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Garzillo, Valerio; Grigutis, Robertas; Jukna, Vytautas

    We investigate the generation of high aspect ratio microstructures across 0.7 mm thick glass by means of single shot Bessel beam laser direct writing. We study the effect on the photoinscription of the cone angle, as well as of the energy and duration of the ultrashort laser pulse. The aim of the study is to optimize the parameters for the writing of a regular microstructure due to index modification along the whole sample thickness. By using a spectrally resolved single pulse transmission diagnostics at the output surface of the glass, we correlate the single shot material modification with observations of themore » absorption in different portions of the retrieved spectra, and with the absence or presence of spectral modulation. Numerical simulations of the evolution of the Bessel pulse intensity and of the energy deposition inside the sample help us interpret the experimental results that suggest to use picosecond pulses for an efficient and more regular energy deposition. Picosecond pulses take advantage of nonlinear plasma absorption and avoid temporal dynamics effects which can compromise the stationarity of the Bessel beam propagation.« less

  20. Note: Proton microbeam formation with continuously variable kinetic energy using a compact system for three-dimensional proton beam writing

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Ohkubo, T., E-mail: ohkubo.takeru@jaea.go.jp; Ishii, Y.

    A compact focused gaseous ion beam system has been developed to form proton microbeams of a few hundreds of keV with a penetration depth of micrometer range in 3-dimensional proton beam writing. Proton microbeams with kinetic energies of 100-140 keV were experimentally formed on the same point at a constant ratio of the kinetic energy of the object side to that of the image side. The experimental results indicate that the beam diameters were measured to be almost constant at approximately 6 μm at the same point with the kinetic energy range. These characteristics of the system were experimentally andmore » numerically demonstrated to be maintained as long as the ratio was constant.« less

  1. Electron beam throughput from raster to imaging

    NASA Astrophysics Data System (ADS)

    Zywno, Marek

    2016-12-01

    Two architectures of electron beam tools are presented: single beam MEBES Exara designed and built by Etec Systems for mask writing, and the Reflected E-Beam Lithography tool (REBL), designed and built by KLA-Tencor under a DARPA Agreement No. HR0011-07-9-0007. Both tools have implemented technologies not used before to achieve their goals. The MEBES X, renamed Exara for marketing purposes, used an air bearing stage running in vacuum to achieve smooth continuous scanning. The REBL used 2 dimensional imaging to distribute charge to a 4k pixel swath to achieve writing times on the order of 1 wafer per hour, scalable to throughput approaching optical projection tools. Three stage architectures were designed for continuous scanning of wafers: linear maglev, rotary maglev, and dual linear maglev.

  2. Production data from a Leica ZBA31H+ shaped e-beam mask writer located at the Photronics facility, Manchester, England

    NASA Astrophysics Data System (ADS)

    Johnson, Stephen; Loughran, Dominic; Osborne, Peter; Sixt, Pierre; Doering, Hans-Joachim

    1999-06-01

    The ZBA31H+) is a variable shaped spot, vector scan e- beam lithography system operating at 20 keV. The specified performance is designed to produce reticles to 250 nanometer design rules, and beyond. In November 98 the acceptance results of a newly installed Leica ZBA31H+), at Photonic Manchester, were presented in a paper at the VDE/VDI 15th European Conference on Mask Technology. This paper is a continuation of that work and presents data from a capability study carried out, on 4000 angstrom EBR9 HS31 resist. Analysis of: mean to target, uniformity, X/Y bias, isolated vs. dense linewidths, linearity, and registration performance of the tool is presented, and the effects of re- iterative develop on process capability compared. Theoretically, a shaped beam system has advantages over raster scan in terms of write time and edge definition capabilities. In this paper, comparative write times against an Etec Mebes 4500 system are included. The ZBA31H+) has to write very small polygons in order to image non-axial or non-45 degree features. The resulting effect on image quality and write time is investigated. In order to improve the fidelity of small OPC structures, Leica have investigated alternative writing strategies, and their results to data are presented here.

  3. Fabrication of carbon quantum dots with nano-defined position and pattern in one step via sugar-electron-beam writing.

    PubMed

    Weng, Yuyan; Li, Zhiyun; Peng, Lun; Zhang, Weidong; Chen, Gaojian

    2017-12-14

    Quantum dots (QDs) are promising materials in nanophotonics, biological imaging, and even quantum computing. Precise positioning and patterning of QDs is a prerequisite for realizing their actual applications. Contrary to the traditional two discrete steps of fabricating and positioning QDs, herein, a novel sugar-electron-beam writing (SEW) method is reported for producing QDs via electron-beam lithography (EBL) that uses a carefully chosen synthetic resist, poly(2-(methacrylamido)glucopyranose) (PMAG). Carbon QDs (CQDs) could be fabricated in situ through electron beam exposure, and the nanoscale position and luminescence intensity of the produced CQDs could be precisely controlled without the assistance of any other fluorescent matter. We have demonstrated that upon combining an electron beam with a glycopolymer, in situ production of CQDs occurs at the electron beam spot center with nanoscale precision at any place and with any patterns, an advancement that we believe will stimulate innovations in future applications.

  4. Development of a Flyable Acousto-Optic Laser Beam Deflection System for a Head Up Display of the Future.

    DTIC Science & Technology

    Rayleigh criteria). The system was designed for stroke writing but was demonstrated with lissajous writing. The acousto - optic deflectors employed...The report describes a laser display which is to be used in a Head-Up Display of the future. The uniqueness of the display is that it uses acousto ... optic components for the modulation and deflection of the laser beam. As a result, there are no moving parts, which increases the reliability and life

  5. Optimal condition for employing an axicon-generated Bessel beam to fabricate cylindrical microlens arrays

    NASA Astrophysics Data System (ADS)

    Luo, Zhi; Yin, Kai; Dong, Xinran; Duan, Ji’an

    2018-05-01

    A numerical algorithm, modelling the transformation from a Gaussian beam to a Bessel beam, is presented for the purpose to study the optimal condition for employing an axicon-generated Bessel beam to fabricate cylindrical microlens arrays (CMLAs). By applying the numerical algorithm to simulate the spatial intensity distribution behind the axicon under different defects of a rotund-apex and different diameter ratios of an incident beam to the axicon, we find that the diffraction effects formed by the axicon edge can be almost eliminated when the diameter ratio is less than 1:2, but the spatial intensity distribution is disturbed dramatically even a few tens of microns deviation of the apex, especially for the front part of the axicon-generated Bessel beam. Fortunately, the lateral intensity profile in the rear part still maintains a desirable Bessel curve. Therefore, the rear part of the Bessel area and the less than 1:2 diameter ratio are the optimal choice for employing an axicon-generated Bessel beam to implement surface microstructures fabrication. Furthermore, by applying the optimal conditions to direct writing microstructures on fused silica with a femtosecond (fs) laser, a large area close-packed CMLA is fabricated. The CMLA presents high quality and uniformity and its optical performance is also demonstrated.

  6. Fabrication process of superconducting integrated circuits with submicron Nb/AlOx/Nb junctions using electron-beam direct writing technique

    NASA Astrophysics Data System (ADS)

    Aoyagi, Masahiro; Nakagawa, Hiroshi

    1997-07-01

    For enhancing operating speed of a superconducting integrated circuit (IC), the device size must be reduced into the submicron level. For this purpose, we have introduced electron beam (EB) direct writing technique into the fabrication process of a Nb/AlOx/Nb Josephson IC. A two-layer (PMMA/(alpha) M-CMS) resist method called the portable conformable mask (PCM) method was utilized for having a high aspect ratio. The electron cyclotron resonance (ECR) plasma etching technique was utilized. We have fabricated micron or submicron-size Nb/AlOx/Nb Josephson junctions, where the size of the junction was varied from 2 micrometer to 0.5 micrometer at 0.1 micrometer intervals. These junctions were designed for evaluating the spread of the junction critical current. We achieved minimum-to-maximum Ic spread of plus or minus 13% for 0.81-micrometer-square (plus or minus 16% for 0.67-micrometer-square) 100 junctions spreading in 130- micrometer-square area. The size deviation of 0.05 micrometer was estimated from the spread values. We have successfully demonstrated a small-scale logic IC with 0.9-micrometer-square junctions having a 50 4JL OR-gate chain, where 4JL means four junctions logic family. The circuit was designed for measuring the gate delay. We obtained a preliminary result of the OR- gate logic delay, where the minimum delay was 8.6 ps/gate.

  7. Holographic memory using beam steering

    NASA Technical Reports Server (NTRS)

    Chao, Tien-Hsin (Inventor); Hanan, Jay C. (Inventor); Reyes, George F. (Inventor); Zhou, Hanying (Inventor)

    2006-01-01

    A method, apparatus, and system provide the ability for storing holograms at high speed. A single laser diode emits a collimated laser beam to both write to and read from a photorefractice crystal. One or more liquid crystal beam steering spatial light modulators (BSSLMs) or Micro-Electro-Mechanical Systems (MEMS) mirrors steer a reference beam, split from the collimated laser beam, at high speed to the photorefractive crystal.

  8. Femtosecond laser direct writing of monocrystalline hexagonal silver prisms

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Vora, Kevin; Kang, SeungYeon; Moebius, Michael

    Bottom-up growth methods and top-down patterning techniques are both used to fabricate metal nanostructures, each with a distinct advantage: One creates crystalline structures and the other offers precise positioning. Here, we present a technique that localizes the growth of metal crystals to the focal volume of a laser beam, combining advantages from both approaches. We report the fabrication of silver nanoprisms—hexagonal nanoscale silver crystals—through irradiation with focused femtosecond laser pulses. The growth of these nanoprisms is due to a nonlinear optical interaction between femtosecond laser pulses and a polyvinylpyrrolidone film doped with silver nitrate. The hexagonal nanoprisms have bases hundredsmore » of nanometers in size and the crystal growth occurs over exposure times of less than 1 ms (8 orders of magnitude faster than traditional chemical techniques). Electron backscatter diffraction analysis shows that the hexagonal nanoprisms are monocrystalline. The fabrication method combines advantages from both wet chemistry and femtosecond laser direct-writing to grow silver crystals in targeted locations. The results presented in this letter offer an approach to directly positioning and growing silver crystals on a substrate, which can be used for plasmonic devices.« less

  9. Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000

    NASA Astrophysics Data System (ADS)

    Kamikubo, Takashi; Ohnishi, Takayuki; Hara, Shigehiro; Anze, Hirohito; Hattori, Yoshiaki; Tamamushi, Shuichi; Bai, Shufeng; Wang, Jen-Shiang; Howell, Rafael; Chen, George; Li, Jiangwei; Tao, Jun; Wiley, Jim; Kurosawa, Terunobu; Saito, Yasuko; Takigawa, Tadahiro

    2010-09-01

    In electron beam writing on EUV mask, it has been reported that CD linearity does not show simple signatures as observed with conventional COG (Cr on Glass) masks because they are caused by scattered electrons form EUV mask itself which comprises stacked heavy metals and thick multi-layers. To resolve this issue, Mask Process Correction (MPC) will be ideally applicable. Every pattern is reshaped in MPC. Therefore, the number of shots would not increase and writing time will be kept within reasonable range. In this paper, MPC is extended to modeling for correction of CD linearity errors on EUV mask. And its effectiveness is verified with simulations and experiments through actual writing test.

  10. Laser direct synthesis and patterning of silver nano/microstructures on a polymer substrate.

    PubMed

    Liu, Yi-Kai; Lee, Ming-Tsang

    2014-08-27

    This study presents a novel approach for the rapid fabrication of conductive nano/microscale metal structures on flexible polymer substrate (polyimide). Silver film is simultaneously synthesized and patterned on the polyimide substrate using an advanced continuous wave (CW) laser direct writing technology and a transparent, particle-free reactive silver ion ink. The location and shape of the resulting silver patterns are written by a laser beam from a digitally controlled micromirror array device. The silver patterns fabricated by this laser direct synthesis and patterning (LDSP) process exhibit the remarkably low electrical resistivity of 2.1 μΩ cm, which is compatible to the electrical resistivity of bulk silver. This novel LDSP process requires no vacuum chamber or photomasks, and the steps needed for preparation of the modified reactive silver ink are simple and straightforward. There is none of the complexity and instability associated with the synthesis of the nanoparticles that are encountered for the conventional laser direct writing technology which involves nanoparticle sintering process. This LDSP technology is an advanced method of nano/microscale selective metal patterning on flexible substrates that is fast and environmentally benign and shows potential as a feasible process for the roll-to-roll manufacturing of large area flexible electronic devices.

  11. In situ electronic probing of semiconducting nanowires in an electron microscope.

    PubMed

    Fauske, V T; Erlbeck, M B; Huh, J; Kim, D C; Munshi, A M; Dheeraj, D L; Weman, H; Fimland, B O; Van Helvoort, A T J

    2016-05-01

    For the development of electronic nanoscale structures, feedback on its electronic properties is crucial, but challenging. Here, we present a comparison of various in situ methods for electronically probing single, p-doped GaAs nanowires inside a scanning electron microscope. The methods used include (i) directly probing individual as-grown nanowires with a sharp nano-manipulator, (ii) contacting dispersed nanowires with two metal contacts and (iii) contacting dispersed nanowires with four metal contacts. For the last two cases, we compare the results obtained using conventional ex situ litho-graphy contacting techniques and by in situ, direct-write electron beam induced deposition of a metal (Pt). The comparison shows that 2-probe measurements gives consistent results also with contacts made by electron beam induced deposition, but that for 4-probe, stray deposition can be a problem for shorter nanowires. This comparative study demonstrates that the preferred in situ method depends on the required throughput and reliability. © 2015 The Authors Journal of Microscopy © 2015 Royal Microscopical Society.

  12. High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Computer-Aided Design (3BID)

    DOE PAGES

    Fowlkes, Jason D.; Winkler, Robert; Lewis, Brett B.; ...

    2018-02-14

    Currently, there are few techniques that allow true 3D-printing on the nanoscale. The most promising candidate to fill this void is focused electron-beam-induced deposition (FEBID), a resist-free, nanofabrication compatible, direct-write method. The basic working principles of a computer-aided design (CAD) program (3BID) enabling 3D-FEBID is presented and simultaneously released for download. The 3BID capability significantly expands the currently limited toolbox for 3D-nanoprinting, providing access to geometries for optoelectronic, plasmonic, and nanomagnetic applications that were previously unattainable due to the lack of a suitable method for synthesis. In conclusion, the CAD approach supplants trial and error toward more precise/accurate FEBID requiredmore » for real applications/device prototyping.« less

  13. High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Computer-Aided Design (3BID)

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Fowlkes, Jason D.; Winkler, Robert; Lewis, Brett B.

    Currently, there are few techniques that allow true 3D-printing on the nanoscale. The most promising candidate to fill this void is focused electron-beam-induced deposition (FEBID), a resist-free, nanofabrication compatible, direct-write method. The basic working principles of a computer-aided design (CAD) program (3BID) enabling 3D-FEBID is presented and simultaneously released for download. The 3BID capability significantly expands the currently limited toolbox for 3D-nanoprinting, providing access to geometries for optoelectronic, plasmonic, and nanomagnetic applications that were previously unattainable due to the lack of a suitable method for synthesis. In conclusion, the CAD approach supplants trial and error toward more precise/accurate FEBID requiredmore » for real applications/device prototyping.« less

  14. Proton beam writing of microstructures in Agar gel for patterned cell growth

    NASA Astrophysics Data System (ADS)

    Larisch, Wolfgang; Koal, Torsten; Werner, Ronald; Hohlweg, Marcus; Reinert, Tilo; Butz, Tilman

    2011-10-01

    A rather useful prerequisite for many biological and biophysical studies, e.g., for cell-cell communication or neuronal networks, is confined cell growth on micro-structured surfaces. Solidified Agar layers have smooth surfaces which are electrically neutral and thus inhibit receptor binding and cell adhesion. For the first time, Agar microstructures have been manufactured using proton beam writing (PBW). In the irradiated Agar material the polysaccharides are split into oligosaccharides which can easily be washed off leaving Agar-free areas for cell adhesion. The beam diameter of 1 μm allows the fabrication of compartments accommodating single cells which are connected by micrometer-sized channels. Using the external beam the production process is very fast. Up to 50 Petri dishes can be produced per day which makes this technique very suitable for biological investigations which require large throughputs.

  15. Creation of 3D microsculptures in PMMA by multiple angle proton irradiation

    NASA Astrophysics Data System (ADS)

    Andrea, T.; Rothermel, M.; Reinert, T.; Koal, T.; Butz, T.

    2011-10-01

    In recent years the technique of proton beam writing has established itself as a versatile method for the creation of microstructures in resist materials. While these structures can be almost arbitrary in two dimensions, the creation of genuine 3D structures remains a challenge. At the LIPSION accelerator facility a new approach has been developed which combines aspects of ion beam tomography, so far solely an analysis method, with proton beam writing. Key element is the targeted irradiation from multiple angles in order to obtain a much broader range of 3D microstructures than has hitherto been possible. PMMA columns with a diameter of ∼90 μm were used as raw material and placed in an upright position on top of a rotational axis. Using 2.25 MeV protons patterns corresponding to the silhouettes of the desired structures were written from two or more directions. In a subsequent step of chemical etching irradiated portions were dissolved, leaving behind the finished 3D sculpture. Various objects have been created. For the demonstration of the method a 70 μm high model of the Eiffel tower has been sculpted by irradiation from two angles. Using irradiation from three angles a 40 μm wide screw with right-handed thread could be crafted which might find applications in micromachining. Also, a cage structure with a pore size of ca. 20 μm was written with the intention to use it as a scaffold for the growth of biological cells.

  16. Monolithic crystalline cladding microstructures for efficient light guiding and beam manipulation in passive and active regimes

    PubMed Central

    Jia, Yuechen; Cheng, Chen; Vázquez de Aldana, Javier R.; Castillo, Gabriel R.; Rabes, Blanca del Rosal; Tan, Yang; Jaque, Daniel; Chen, Feng

    2014-01-01

    Miniature laser sources with on-demand beam features are desirable devices for a broad range of photonic applications. Lasing based on direct-pump of miniaturized waveguiding active structures offers a low-cost but intriguing solution for compact light-emitting devices. In this work, we demonstrate a novel family of three dimensional (3D) photonic microstructures monolithically integrated in a Nd:YAG laser crystal wafer. They are produced by the femtosecond laser writing, capable of simultaneous light waveguiding and beam manipulation. In these guiding systems, tailoring of laser modes by both passive/active beam splitting and ring-shaped transformation are achieved by an appropriate design of refractive index patterns. Integration of graphene thin-layer as saturable absorber in the 3D laser structures allows for efficient passive Q-switching of tailored laser radiations which may enable miniature waveguiding lasers for broader applications. Our results pave a way to construct complex integrated passive and active laser circuits in dielectric crystals by using femtosecond laser written monolithic photonic chips. PMID:25100561

  17. Graphene engineering by neon ion beams

    DOE PAGES

    Iberi, Vighter; Ievlev, Anton V.; Vlassiouk, Ivan; ...

    2016-02-18

    Achieving the ultimate limits of materials and device performance necessitates the engineering of matter with atomic, molecular, and mesoscale fidelity. While common for organic and macromolecular chemistry, these capabilities are virtually absent for 2D materials. In contrast to the undesired effect of ion implantation from focused ion beam (FIB) lithography with gallium ions, and proximity effects in standard e-beam lithography techniques, the shorter mean free path and interaction volumes of helium and neon ions offer a new route for clean, resist free nanofabrication. Furthermore, with the advent of scanning helium ion microscopy, maskless He + and Ne + beam lithographymore » of graphene based nanoelectronics is coming to the forefront. Here, we will discuss the use of energetic Ne ions in engineering graphene devices and explore the mechanical, electromechanical and chemical properties of the ion-milled devices using scanning probe microscopy (SPM). By using SPM-based techniques such as band excitation (BE) force modulation microscopy, Kelvin probe force microscopy (KPFM) and Raman spectroscopy, we demonstrate that the mechanical, electrical and optical properties of the exact same devices can be quantitatively extracted. Additionally, the effect of defects inherent in ion beam direct-write lithography, on the overall performance of the fabricated devices is elucidated.« less

  18. Laser Scanning Holographic Lithography for Flexible 3D Fabrication of Multi-Scale Integrated Nano-structures and Optical Biosensors

    PubMed Central

    Yuan, Liang (Leon); Herman, Peter R.

    2016-01-01

    Three-dimensional (3D) periodic nanostructures underpin a promising research direction on the frontiers of nanoscience and technology to generate advanced materials for exploiting novel photonic crystal (PC) and nanofluidic functionalities. However, formation of uniform and defect-free 3D periodic structures over large areas that can further integrate into multifunctional devices has remained a major challenge. Here, we introduce a laser scanning holographic method for 3D exposure in thick photoresist that combines the unique advantages of large area 3D holographic interference lithography (HIL) with the flexible patterning of laser direct writing to form both micro- and nano-structures in a single exposure step. Phase mask interference patterns accumulated over multiple overlapping scans are shown to stitch seamlessly and form uniform 3D nanostructure with beam size scaled to small 200 μm diameter. In this way, laser scanning is presented as a facile means to embed 3D PC structure within microfluidic channels for integration into an optofluidic lab-on-chip, demonstrating a new laser HIL writing approach for creating multi-scale integrated microsystems. PMID:26922872

  19. Sub-10-nm suspended nano-web formation by direct laser writing

    NASA Astrophysics Data System (ADS)

    Wang, Sihao; Yu, Ye; Liu, Hailong; Lim, Kevin T. P.; Madurai Srinivasan, Bharathi; Zhang, Yong Wei; Yang, Joel K. W.

    2018-06-01

    A diffraction-limited three-dimensional (3D) direct laser writing (DLW) system based on two-photon polymerization can routinely pattern structures at the 100 nm length scale. Several schemes have been developed to improve the patterning resolution of 3D DLW but often require customized resist formulations or multi-wavelength exposures. Here, we introduce a scheme to produce suspended nano-webs with feature sizes below 10 nm in IP-Dip resist using sub-threshold exposure conditions in a commercial DLW system. The narrowest suspended lines (nano-webs) measured 7 nm in width. Larger ∼20 nm nano-webs were patterned with ∼80% yield at increased laser powers. In addition, closely spaced nano-gaps with a center-to-center distance of 33 nm were produced by patterning vertically displaced suspended lines followed by metal deposition and liftoff. We provide hypotheses and present preliminary results for a mechanism involving the initiation of a percolative path and a strain-induced narrowing in the nano-web formation. Our approach allows selective features to be patterned with dimensions comparable to the sub-10 nm patterning capability of electron-beam lithography (EBL).

  20. Automated Geometry assisted PEC for electron beam direct write nanolithography

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Ocola, Leonidas E.; Gosztola, David J.; Rosenmann, Daniel

    Nanoscale geometry assisted proximity effect correction (NanoPEC) is demonstrated to improve PEC for nanoscale structures over standard PEC, in terms of feature sharpness for sub-100 nm structures. The method was implemented onto an existing commercially available PEC software. Plasmonic arrays of crosses were fabricated using regular PEC and NanoPEC, and optical absorbance was measured. Results confirm that the improved sharpness of the structures leads to increased sharpness in the optical absorbance spectrum features. We also demonstrated that this method of PEC is applicable to arbitrary shaped structures beyond crosses.

  1. Focused electron beam based direct-write fabrication of graphene and amorphous carbon from oxo-functionalized graphene on silicon dioxide.

    PubMed

    Schindler, Severin; Vollnhals, Florian; Halbig, Christian E; Marbach, Hubertus; Steinrück, Hans-Peter; Papp, Christian; Eigler, Siegfried

    2017-01-25

    Controlled patterning of graphene is an important task towards device fabrication and thus is the focus of current research activities. Graphene oxide (GO) is a solution-processible precursor of graphene. It can be patterned by thermal processing. However, thermal processing of GO leads to decomposition and CO 2 formation. Alternatively, focused electron beam induced processing (FEBIP) techniques can be used to pattern graphene with high spatial resolution. Based on this approach, we explore FEBIP of GO deposited on SiO 2 . Using oxo-functionalized graphene (oxo-G) with an in-plane lattice defect density of 1% we are able to image the electron beam-induced effects by scanning Raman microscopy for the first time. Depending on electron energy (2-30 keV) and doses (50-800 mC m -2 ) either reduction of GO or formation of permanent lattice defects occurs. This result reflects a step towards controlled FEBIP processing of oxo-G.

  2. Localized conductive patterning via focused electron beam reduction of graphene oxide

    NASA Astrophysics Data System (ADS)

    Kim, Songkil; Kulkarni, Dhaval D.; Henry, Mathias; Zackowski, Paul; Jang, Seung Soon; Tsukruk, Vladimir V.; Fedorov, Andrei G.

    2015-03-01

    We report on a method for "direct-write" conductive patterning via reduction of graphene oxide (GO) sheets using focused electron beam induced deposition (FEBID) of carbon. FEBID treatment of the intrinsically dielectric graphene oxide between two metal terminals opens up the conduction channel, thus enabling a unique capability for nanoscale conductive domain patterning in GO. An increase in FEBID electron dose results in a significant increase of the domain electrical conductivity with improving linearity of drain-source current vs. voltage dependence, indicative of a change of graphene oxide electronic properties from insulating to semiconducting. Density functional theory calculations suggest a possible mechanism underlying this experimentally observed phenomenon, as localized reduction of graphene oxide layers via interactions with highly reactive intermediates of electron-beam-assisted dissociation of surface-adsorbed hydrocarbon molecules. These findings establish an unusual route for using FEBID as nanoscale lithography and patterning technique for engineering carbon-based nanomaterials and devices with locally tailored electronic properties.

  3. Electron Beam "Writes" Silicon On Sapphire

    NASA Technical Reports Server (NTRS)

    Heinemann, Klaus

    1988-01-01

    Method of growing silicon on sapphire substrate uses beam of electrons to aid growth of semiconductor material. Silicon forms as epitaxial film in precisely localized areas in micron-wide lines. Promising fabrication method for fast, densely-packed integrated circuits. Silicon deposited preferentially in contaminated substrate zones and in clean zone irradiated by electron beam. Electron beam, like surface contamination, appears to stimulate decomposition of silane atmosphere.

  4. The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors

    PubMed Central

    Thorman, Rachel M; Kumar T. P., Ragesh; Fairbrother, D Howard

    2015-01-01

    Summary Focused electron beam induced deposition (FEBID) is a single-step, direct-write nanofabrication technique capable of writing three-dimensional metal-containing nanoscale structures on surfaces using electron-induced reactions of organometallic precursors. Currently FEBID is, however, limited in resolution due to deposition outside the area of the primary electron beam and in metal purity due to incomplete precursor decomposition. Both limitations are likely in part caused by reactions of precursor molecules with low-energy (<100 eV) secondary electrons generated by interactions of the primary beam with the substrate. These low-energy electrons are abundant both inside and outside the area of the primary electron beam and are associated with reactions causing incomplete ligand dissociation from FEBID precursors. As it is not possible to directly study the effects of secondary electrons in situ in FEBID, other means must be used to elucidate their role. In this context, gas phase studies can obtain well-resolved information on low-energy electron-induced reactions with FEBID precursors by studying isolated molecules interacting with single electrons of well-defined energy. In contrast, ultra-high vacuum surface studies on adsorbed precursor molecules can provide information on surface speciation and identify species desorbing from a substrate during electron irradiation under conditions more representative of FEBID. Comparing gas phase and surface science studies allows for insight into the primary deposition mechanisms for individual precursors; ideally, this information can be used to design future FEBID precursors and optimize deposition conditions. In this review, we give a summary of different low-energy electron-induced fragmentation processes that can be initiated by the secondary electrons generated in FEBID, specifically, dissociative electron attachment, dissociative ionization, neutral dissociation, and dipolar dissociation, emphasizing the different nature and energy dependence of each process. We then explore the value of studying these processes through comparative gas phase and surface studies for four commonly-used FEBID precursors: MeCpPtMe3, Pt(PF3)4, Co(CO)3NO, and W(CO)6. Through these case studies, it is evident that this combination of studies can provide valuable insight into potential mechanisms governing deposit formation in FEBID. Although further experiments and new approaches are needed, these studies are an important stepping-stone toward better understanding the fundamental physics behind the deposition process and establishing design criteria for optimized FEBID precursors. PMID:26665061

  5. The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors.

    PubMed

    Thorman, Rachel M; Kumar T P, Ragesh; Fairbrother, D Howard; Ingólfsson, Oddur

    2015-01-01

    Focused electron beam induced deposition (FEBID) is a single-step, direct-write nanofabrication technique capable of writing three-dimensional metal-containing nanoscale structures on surfaces using electron-induced reactions of organometallic precursors. Currently FEBID is, however, limited in resolution due to deposition outside the area of the primary electron beam and in metal purity due to incomplete precursor decomposition. Both limitations are likely in part caused by reactions of precursor molecules with low-energy (<100 eV) secondary electrons generated by interactions of the primary beam with the substrate. These low-energy electrons are abundant both inside and outside the area of the primary electron beam and are associated with reactions causing incomplete ligand dissociation from FEBID precursors. As it is not possible to directly study the effects of secondary electrons in situ in FEBID, other means must be used to elucidate their role. In this context, gas phase studies can obtain well-resolved information on low-energy electron-induced reactions with FEBID precursors by studying isolated molecules interacting with single electrons of well-defined energy. In contrast, ultra-high vacuum surface studies on adsorbed precursor molecules can provide information on surface speciation and identify species desorbing from a substrate during electron irradiation under conditions more representative of FEBID. Comparing gas phase and surface science studies allows for insight into the primary deposition mechanisms for individual precursors; ideally, this information can be used to design future FEBID precursors and optimize deposition conditions. In this review, we give a summary of different low-energy electron-induced fragmentation processes that can be initiated by the secondary electrons generated in FEBID, specifically, dissociative electron attachment, dissociative ionization, neutral dissociation, and dipolar dissociation, emphasizing the different nature and energy dependence of each process. We then explore the value of studying these processes through comparative gas phase and surface studies for four commonly-used FEBID precursors: MeCpPtMe3, Pt(PF3)4, Co(CO)3NO, and W(CO)6. Through these case studies, it is evident that this combination of studies can provide valuable insight into potential mechanisms governing deposit formation in FEBID. Although further experiments and new approaches are needed, these studies are an important stepping-stone toward better understanding the fundamental physics behind the deposition process and establishing design criteria for optimized FEBID precursors.

  6. Improved optical efficiency of bulk laser amplifiers with femtosecond written waveguides

    NASA Astrophysics Data System (ADS)

    Bukharin, Mikhail A.; Lyashedko, Andrey; Skryabin, Nikolay N.; Khudyakov, Dmitriy V.; Vartapetov, Sergey K.

    2016-04-01

    In the paper we proposed improved technique of three-dimensional waveguides writing with direct femtosecond laser inscription technology. The technique allows, for the first time of our knowledge, production of waveguides with mode field diameter larger than 200 μm. This result broadens field of application of femtosecond writing technology into bulk laser schemes and creates an opportunity to develop novel amplifiers with increased efficiency. We proposed a novel architecture of laser amplifier that combines free-space propagation of signal beam with low divergence and propagation of pump irradiation inside femtosecond written waveguide with large mode field diameter due to total internal reflection effect. Such scheme provides constant tight confinement of pump irradiation over the full length of active laser element (3-10 cm). The novel amplifier architecture was investigated numerically and experimentally in Nd:phosphate glass. Waveguides with 200 μm mode field diameter were written with high frequency femtosecond oscillator. Proposed technique of three-dimensional waveguides writing based on decreasing and compensation of spherical aberration effect due to writing in heat cumulative regime and dynamic pulse energy adjustment at different depths of writing. It was shown, that written waveguides could increase optical efficiency of amplifier up to 4 times compared with corresponding usual free-space schemes. Novelty of the results consists in technique of femtosecond writing of waveguides with large mode field diameter. Actuality of the results consists in originally proposed architecture allows to improve up to 4 times optical efficiency of conventional bulk laser schemes and especially ultrafast pulse laser amplifiers.

  7. Expressive/Exploratory Technical Writing (XTW) in Engineering: Shifting the Technical Writing Curriculum

    ERIC Educational Resources Information Center

    Warnock, Scott; Kahn, Michael

    2007-01-01

    While the importance of "expressive writing," or informal, self-directed writing, has been well established, teachers underutilize it, particularly in technical writing courses. We introduce the term expressive/exploratory technical writing (XTW), which is the use of informal, self-directed writing to problem-solve in technical fields. We describe…

  8. Diode-laser pumping into the emitting level for efficient lasing of depressed cladding waveguides realized in Nd:YVO4 by the direct femtosecond-laser writing technique.

    PubMed

    Pavel, Nicolaie; Salamu, Gabriela; Jipa, Florin; Zamfirescu, Marian

    2014-09-22

    Depressed cladding waveguides have been realized in Nd:YVO(4) employing direct writing technique with a femtosecond-laser beam. It was shown that the output performances of such laser devices are improved by the reduction of the quantum defect between the pump wavelength and the laser wavelength. Thus, under the classical pump at 808 nm (i.e. into the (4)F(5/2) level), a 100-μm diameter circular waveguide inscribed in a 0.7-at.% Nd:YVO(4) outputted 1.06-μm laser pulses with 3.0-mJ energy, at 0.30 optical efficiency and slope efficiency of 0.32. The pump at 880 nm (i.e.directly into the (4)F(3/2) emitting level) increased the pulse energy at 3.8 mJ and improved both optical efficiency and slope efficiency at 0.36 and 0.39, respectively. The same waveguide yielded continuous-wave 1.5-W output power at 1.06 μm under the pump at 880 nm. Laser emission at 1.34 μm was also improved using the pump into the (4)F(3/2) emitting level of Nd:YVO(4).

  9. Direct-Write Fabrication of Cellulose Nano-Structures via Focused Electron Beam Induced Nanosynthesis

    PubMed Central

    Ganner, Thomas; Sattelkow, Jürgen; Rumpf, Bernhard; Eibinger, Manuel; Reishofer, David; Winkler, Robert; Nidetzky, Bernd; Spirk, Stefan; Plank, Harald

    2016-01-01

    In many areas of science and technology, patterned films and surfaces play a key role in engineering and development of advanced materials. Here, we introduce a new generic technique for the fabrication of polysaccharide nano-structures via focused electron beam induced conversion (FEBIC). For the proof of principle, organosoluble trimethylsilyl-cellulose (TMSC) thin films have been deposited by spin coating on SiO2 / Si and exposed to a nano-sized electron beam. It turns out that in the exposed areas an electron induced desilylation reaction takes place converting soluble TMSC to rather insoluble cellulose. After removal of the unexposed TMSC areas, structured cellulose patterns remain on the surface with FWHM line widths down to 70 nm. Systematic FEBIC parameter sweeps reveal a generally electron dose dependent behavior with three working regimes: incomplete conversion, ideal doses and over exposure. Direct (FT-IR) and indirect chemical analyses (enzymatic degradation) confirmed the cellulosic character of ideally converted areas. These investigations are complemented by a theoretical model which suggests a two-step reaction process by means of TMSC → cellulose and cellulose → non-cellulose material conversion in excellent agreement with experimental data. The extracted, individual reaction rates allowed the derivation of design rules for FEBIC parameters towards highest conversion efficiencies and highest lateral resolution. PMID:27585861

  10. Write! Write! Write! Ready-to-Use Writing Process Activities for Grades 4-8.

    ERIC Educational Resources Information Center

    Behrman, Carol H.

    This handbook contains over 265 reproducible writing process activities that help make writing fun for students in grades 4-8. The handbook provides stimulating activities to give students the directed practice they need to learn to write clearly and competently. Designed for minimal teacher input, activities are complete with directions geared to…

  11. Creating aperiodic photonic structures by synthesized Mathieu-Gauss beams

    NASA Astrophysics Data System (ADS)

    Vasiljević, Jadranka M.; Zannotti, Alessandro; Timotijević, Dejan V.; Denz, Cornelia; Savić, Dragana M. Jović

    2017-08-01

    We demonstrate a kind of aperiodic photonic structure realized using the interference of multiple Mathieu-Gauss beams. Depending on the beam configurations, their mutual distances, angles of rotation, or phase relations we are able to observe different classes of such aperiodic optically induced refractive index structures. Our experimental approach is based on the optical induction in a single parallel writing process.

  12. Resist characteristics with direct-write electron beam and SCALPEL exposure system

    NASA Astrophysics Data System (ADS)

    Sato, Mitsuru; Omori, Katsumi; Ishikawa, Kiyoshi; Nakayama, Toshimasa; Novembre, Anthony E.; Ocola, Leonidas E.

    1999-06-01

    High acceleration voltage electron beam exposure is one of the possible candidates for post-optical lithography. The use of electrons, instead of photons, avoids optical related problems such as the standing wave issues. However, resists must conform to certain needs for the SCALPEL system, such as exposure in a vacuum chamber with 100kv electron beams. Taking into account the challenging requirements of high resolution, high sensitivity, low bake dependency and no outgassing, TOK has been able to develop resists to meet most of the SCALPEL system needs. However, due to the nature of chemical amplification and the PEB dependency, as is the case with DUV resist which varies for different features, we must recommend different resist for multiple features such as dense lines, isolated lines and contact holes. TOK has designed an electron beam negative resist, EN-009, which demonstrate 100nm pattern resolution. The dose to print on the SCALPEL system is 5.0(mu) C/cm2. The electron beam positive resist, EP-004M, has been designed for line and space patterns. The dose to print on the SCALPEL system is 8.25(mu) C/cm2. The processing conditions are standard, using 0.26N developer. These are the lowest exposure energies reported to date for similar resolution on this exposure tools.

  13. Chemical degradation and morphological instabilities during focused ion beam prototyping of polymers.

    PubMed

    Orthacker, A; Schmied, R; Chernev, B; Fröch, J E; Winkler, R; Hobisch, J; Trimmel, G; Plank, H

    2014-01-28

    Focused ion beam processing of low melting materials, such as polymers or biological samples, often leads to chemical and morphological instabilities which prevent the straight-forward application of this versatile direct-write structuring method. In this study the behaviour of different polymer classes under ion beam exposure is investigated using different patterning parameters and strategies with the aim of (i) correlating local temperatures with the polymers' chemistry and its morphological consequences; and (ii) finding a way of processing sensitive polymers with lowest chemical degradation while maintaining structuring times. It is found that during processing of polymers three temperature regimes can be observed: (1) at low temperatures all polymers investigated show stable chemical and morphological behaviour; (2) very high temperatures lead to strong chemical degradation which entails unpredictable morphologies; and (3) in the intermediate temperature regime the behaviour is found to be strongly material dependent. A detailed look reveals that polymers which rather cross-link in the proximity of the beam show stable morphologies in this intermediate regime, while polymers that rather undergo chain scission show tendencies to develop a creeping phase, where material follows the ion beam movement leading to instable and unpredictable morphologies. Finally a simple, alternative patterning strategy is suggested, which allows stable processing conditions with lowest chemical damage even for challenging polymers undergoing chain scission.

  14. On the angular dependence of focused laser ablation by nanosecond pulses in solgel and polymer materials

    NASA Astrophysics Data System (ADS)

    George, D. S.; Onischenko, A.; Holmes, A. S.

    2004-03-01

    Focused laser ablation by single laser pulses at varying angles of incidence is studied in two materials of interest: a solgel (Ormocer 4) and a polymer (SU8). For a range of angles (up to 70° from normal), and for low-energy (<20 μJ), 40 ns pulses at 266 nm wavelength, the ablation depth along the direction of the incident laser beam is found to be independent of the angle of incidence. This allows the crater profiles at oblique incidence to be generated directly from the crater profiles at normal incidence by a simple coordinate transformation. This result is of use in the development of simulation tools for direct-write laser ablation. A simple model based on the moving ablation front approach is shown to be consistent with the observed behavior.

  15. Quantum-dot based nanothermometry in optical plasmonic recording media

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Maestro, Laura Martinez; Centre for Micro-Photonics, Faculty of Science, Engineering and Technology, Swinburne University of Technology, Hawthorn, Victoria 3122; Zhang, Qiming

    2014-11-03

    We report on the direct experimental determination of the temperature increment caused by laser irradiation in a optical recording media constituted by a polymeric film in which gold nanorods have been incorporated. The incorporation of CdSe quantum dots in the recording media allowed for single beam thermal reading of the on-focus temperature from a simple analysis of the two-photon excited fluorescence of quantum dots. Experimental results have been compared with numerical simulations revealing an excellent agreement and opening a promising avenue for further understanding and optimization of optical writing processes and media.

  16. Multi-shaped beam: development status and update on lithography results

    NASA Astrophysics Data System (ADS)

    Slodowski, Matthias; Doering, Hans-Joachim; Dorl, Wolfgang; Stolberg, Ines A.

    2011-04-01

    According to the ITRS [1] photo mask is a significant challenge for the 22nm technology node requirements and beyond. Mask making capability and cost escalation continue to be critical for future lithography progress. On the technological side mask specifications and complexity have increased more quickly than the half-pitch requirements on the wafer designated by the roadmap due to advanced optical proximity correction and double patterning demands. From the economical perspective mask costs have significantly increased each generation, in which mask writing represents a major portion. The availability of a multi-electron-beam lithography system for mask write application is considered a potential solution to overcome these challenges [2, 3]. In this paper an update of the development status of a full-package high-throughput multi electron-beam writer, called Multi Shaped Beam (MSB), will be presented. Lithography performance results, which are most relevant for mask writing applications, will be disclosed. The MSB technology is an evolutionary development of the matured single Variable Shaped Beam (VSB) technology. An arrangement of Multi Deflection Arrays (MDA) allows operation with multiple shaped beams of variable size, which can be deflected and controlled individually [4]. This evolutionary MSB approach is associated with a lower level of risk and a relatively short time to implementation compared to the known revolutionary concepts [3, 5, 6]. Lithography performance is demonstrated through exposed pattern. Further details of the substrate positioning platform performance will be disclosed. It will become apparent that the MSB operational mode enables lithography on the same and higher performance level compared to single VSB and that there are no specific additional lithography challenges existing beside those which have already been addressed [1].

  17. Effective data compaction algorithm for vector scan EB writing system

    NASA Astrophysics Data System (ADS)

    Ueki, Shinichi; Ashida, Isao; Kawahira, Hiroichi

    2001-01-01

    We have developed a new mask data compaction algorithm dedicated to vector scan electron beam (EB) writing systems for 0.13 μm device generation. Large mask data size has become a significant problem at mask data processing for which data compaction is an important technique. In our new mask data compaction, 'array' representation and 'cell' representation are used. The mask data format for the EB writing system with vector scan supports these representations. The array representation has a pitch and a number of repetitions in both X and Y direction. The cell representation has a definition of figure group and its reference. The new data compaction method has the following three steps. (1) Search arrays of figures by selecting pitches of array so that a number of figures are included. (2) Find out same arrays that have same repetitive pitch and number of figures. (3) Search cells of figures, where the figures in each cell take identical positional relationship. By this new method for the mask data of a 4M-DRAM block gate layer with peripheral circuits, 202 Mbytes without compaction was highly compacted to 6.7 Mbytes in 20 minutes on a 500 MHz PC.

  18. Laser direct writing of micro- and nano-scale medical devices

    PubMed Central

    Gittard, Shaun D; Narayan, Roger J

    2010-01-01

    Laser-based direct writing of materials has undergone significant development in recent years. The ability to modify a variety of materials at small length scales and using short production times provides laser direct writing with unique capabilities for fabrication of medical devices. In many laser-based rapid prototyping methods, microscale and submicroscale structuring of materials is controlled by computer-generated models. Various laser-based direct write methods, including selective laser sintering/melting, laser machining, matrix-assisted pulsed-laser evaporation direct write, stereolithography and two-photon polymerization, are described. Their use in fabrication of microstructured and nanostructured medical devices is discussed. Laser direct writing may be used for processing a wide variety of advanced medical devices, including patient-specific prostheses, drug delivery devices, biosensors, stents and tissue-engineering scaffolds. PMID:20420557

  19. Task factor usability ratings for different age groups writing Chinese.

    PubMed

    Chan, A H S; So, J C Y

    2009-11-01

    This study evaluated how different task factors affect performance and user subjective preferences for three different age groups of Chinese subjects (6-11, 20-23, 65-70 years) when hand writing Chinese characters. The subjects copied Chinese character sentences with different settings for the task factors of writing plane angle (horizontal 0 degrees , slanted 15 degrees ), writing direction (horizontal, vertical), and line spacing (5 mm, 7 mm and no lines). Writing speed was measured and subjective preferences (effectiveness and satisfaction) were assessed for each of the task factor settings. The result showed that there was a conflict between writing speed and personal preference for the line spacing factor; 5 mm line spacing increased writing speed but it was the least preferred. It was also found that: vertical and horizontal writing directions and a slanted work surface suited school-aged children; a horizontal work surface and horizontal writing direction suited university students; and a horizontal writing direction with either a horizontal or slanted work surface suited the older adults.

  20. Direct printing of micro/nanostructures by femtosecond laser excitation of nanocrystals

    NASA Astrophysics Data System (ADS)

    Shou, Wan; Pan, Heng

    2017-02-01

    Direct writing using single or multiple energized beams (e.g. laser, ion or electron beams) provides high feature resolution (<1μm) compared with other solution-based printing methods (e.g. inkjet printing). There have been extensive researches on micro/nano additive manufacturing methods employing laser (or optical) and ion/electron beams. Many of these processes utilize specially designed photosensitive materials consisting of additives and effective components. Due to the presence of additive (such as polymer and binders), the effective components are relatively low resulting in high threshold for device operation. In order to direct print functional devices at low cost, there has been extensive research on laser processing of pre-synthesized nanomaterials for non-polymer functional device manufacturing. Pre-synthesized nanocrystals can have better control in the stoichiometry and crystallinity. In addition, pre-synthesis process enjoys the flexibility in material choice since a variety of materials can be synthesized. Femtosecond laser assembly and deposition of nanomaterials can be a feasible 3D micro/nano additive manufacturing approach, although mechanisms leading to assembly and deposition have not been fully understood. In this paper, we propose a mechanism for 2D and 3D deposition of nanocrystals by laser excitation with moderate peak intensities(1011-1012 W/cm2). It is postulated that laser induced charging is responsible for the deposition. The scheme paves the way for laser selective electrophoretic deposition as a micro/nanoscale additive manufacturing approach.

  1. Design and fabrication of nano-imprint templates using unique pattern transforms and primitives

    NASA Astrophysics Data System (ADS)

    MacDonald, Susan; Mellenthin, David; Rentzsch, Kevin; Kramer, Kenneth; Ellenson, James; Hostetler, Tim; Enck, Ron

    2005-11-01

    Increasing numbers of MEMS, photonic, and integrated circuit manufacturers are investigating the use of Nano-imprint Lithography or Step and Flash Imprint Lithography (SFIL) as a lithography choice for making various devices and products. Their main interests in using these technologies are the lack of aberrations inherent in traditional optical reduction lithography, and the relative low cost of imprint tools. Since imprint templates are at 1X scale, the small sizes of these structures have necessitated the use of high-resolution 50KeV, and 100KeV e-beam lithography tools to build these templates. For MEMS and photonic applications, the structures desired are often circles, arches, and other non-orthogonal shapes. It has long been known that both 50keV, and especially 100keV e-beam lithography tools are extremely accurate, and can produce very high resolution structures, but the trade off is long write times. The main drivers in write time are shot count and stage travel. This work will show how circles and other non-orthogonal shapes can be produced with a 50KeV Variable Shaped Beam (VSB) e-beam lithography system using unique pattern transforms and primitive shapes, while keeping the shot count and write times under control. The quality of shapes replicated into the resist on wafer using an SFIL tool will also be presented.

  2. Experimental, theoretical, and device application development of nanoscale focused electron-beam-induced deposition

    NASA Astrophysics Data System (ADS)

    Randolph, Steven Jeffrey

    Electron-beam-induced deposition (EBID) is a highly versatile nanofabrication technique that allows for growth of a variety of materials with nanoscale precision and resolution. While several applications and studies of EBID have been reported and published, there is still a significant lack of understanding of the complex mechanisms involved in the process. Consequently, EBID process control is, in general, limited and certain common experimental results regarding nanofiber growth have yet to be fully explained. Such anomalous results have been addressed in this work both experimentally and by computer simulation. Specifically, a correlation between SiOx nanofiber deposition observations and the phenomenon of electron beam heating (EBH) was shown by comparison of thermal computer models and experimental results. Depending on the beam energy, beam current, and nanostructure geometry, the heat generated can be substantial and may influence the deposition rate. Temperature dependent EBID growth experiments qualitatively verified the results of the EBH model. Additionally, EBID was used to produce surface image layers for maskless, direct-write lithography (MDL). A single layer process used directly written SiOx features as a masking layer for amorphous silicon thin films. A bilayer process implemented a secondary masking layer consisting of standard photoresist into which a pattern---directly written by EBID tungsten---was transferred. The single layer process was found to be extremely sensitive to the etch selectivity of the plasma etch. In the bilayer process, EBID tungsten was written onto photoresist and the pattern transferred by means of oxygen plasma dry development following a brief refractory descum. Conditions were developed to reduce the spatial spread of electrons in the photoresist layer and obtain ˜ 35 nm lines. Finally, an EBID-based technique for field emitter repair was applied to the Digital Electrostatically focused e-beam Array Lithography (DEAL) parallel electron beam lithography configuration to repair damaged or missing carbon nanofiber cathodes. The I-V response and lithography results from EBID tungsten-based devices were comparable to CNF-based DEAL devices indicating a successful repair technique.

  3. Advanced manufacturing—A transformative enabling capability for fusion

    DOE PAGES

    Nygren, Richard E.; Dehoff, Ryan R.; Youchison, Dennis L.; ...

    2018-05-24

    Additive Manufacturing (AM) can create novel and complex engineered material structures. Features such as controlled porosity, micro-fibers and/or nano-particles, transitions in materials and integral robust coatings can be important in developing solutions for fusion subcomponents. A realistic understanding of this capability would be particularly valuable in identifying development paths. Major concerns for using AM processes with lasers or electron beams that melt powder to make refractory parts are the power required and residual stresses arising in fabrication. A related issue is the required combination of lasers or e-beams to continue heating of deposited material (to reduce stresses) and to depositmore » new material at a reasonable built rate while providing adequate surface finish and resolution for meso-scale features. In conclusion, Some Direct Write processes that can make suitable preforms and be cured to an acceptable density may offer another approach for PFCs.« less

  4. Nano-imaging of single cells using STIM

    NASA Astrophysics Data System (ADS)

    Minqin, Ren; van Kan, J. A.; Bettiol, A. A.; Daina, Lim; Gek, Chan Yee; Huat, Bay Boon; Whitlow, H. J.; Osipowicz, T.; Watt, F.

    2007-07-01

    Scanning transmission ion microscopy (STIM) is a technique which utilizes the energy loss of high energy (MeV) ions passing through a sample to provide structural images. In this paper, we have successfully demonstrated STIM imaging of single cells at the nano-level using the high resolution capability of the proton beam writing facility at the Centre for Ion Beam Applications, National University of Singapore. MCF-7 breast cancer cells (American Type Culture Collection [ATCC]) were seeded on to silicon nitride windows, backed by a Hamamatsu pin diode acting as a particle detector. A reasonable contrast was obtained using 1 MeV protons and excellent contrast obtained using 1 MeV alpha particles. In a further experiment, nano-STIM was also demonstrated using cells seeded on to the pin diode directly, and high quality nano-STIM images showing the nucleus and multiple nucleoli were extracted before the detector was significantly damaged.

  5. Dynamically controlled deposition of colloidal nanoparticle suspension in evaporating drops using laser radiation.

    PubMed

    Ta, V D; Carter, R M; Esenturk, E; Connaughton, C; Wasley, T J; Li, J; Kay, R W; Stringer, J; Smith, P J; Shephard, J D

    2016-05-18

    Dynamic control of the distribution of polystyrene suspended nanoparticles in evaporating droplets is investigated using a 2.9 μm high power laser. Under laser radiation a droplet is locally heated and fluid flows are induced that overcome the capillary flow, and thus a reversal of the coffee-stain effect is observed. Suspension particles are accumulated in a localised area, one order of magnitude smaller than the original droplet size. By scanning the laser beam over the droplet, particles can be deposited in an arbitrary pattern. This finding raises the possibility for direct laser writing of suspended particles through a liquid layer. Furthermore, a highly uniform coating is possible by manipulating the laser beam diameter and exposure time. The effect is expected to be universally applicable to aqueous solutions independent of solutes (either particles or molecules) and deposited substrates.

  6. Advanced manufacturing—A transformative enabling capability for fusion

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Nygren, Richard E.; Dehoff, Ryan R.; Youchison, Dennis L.

    Additive Manufacturing (AM) can create novel and complex engineered material structures. Features such as controlled porosity, micro-fibers and/or nano-particles, transitions in materials and integral robust coatings can be important in developing solutions for fusion subcomponents. A realistic understanding of this capability would be particularly valuable in identifying development paths. Major concerns for using AM processes with lasers or electron beams that melt powder to make refractory parts are the power required and residual stresses arising in fabrication. A related issue is the required combination of lasers or e-beams to continue heating of deposited material (to reduce stresses) and to depositmore » new material at a reasonable built rate while providing adequate surface finish and resolution for meso-scale features. In conclusion, Some Direct Write processes that can make suitable preforms and be cured to an acceptable density may offer another approach for PFCs.« less

  7. Efficient Second Harmonic Generation in 3D Nonlinear Optical-Lattice-Like Cladding Waveguide Splitters by Femtosecond Laser Inscription

    PubMed Central

    Nie, Weijie; Jia, Yuechen; Vázquez de Aldana, Javier R.; Chen, Feng

    2016-01-01

    Integrated photonic devices with beam splitting function are intriguing for a broad range of photonic applications. Through optical-lattice-like cladding waveguide structures fabricated by direct femtosecond laser writing, the light propagation can be engineered via the track-confined refractive index profiles, achieving tailored output beam distributions. In this work, we report on the fabrication of 3D laser-written optical-lattice-like structures in a nonlinear KTP crystal to implement 1 × 4 beam splitting. Second harmonic generation (SHG) of green light through these nonlinear waveguide beam splitter structures provides the capability for the compact visible laser emitting devices. With Type II phase matching of the fundamental wavelength (@ 1064 nm) to second harmonic waves (@ 532 nm), the frequency doubling has been achieved through this three-dimensional beam splitter. Under 1064-nm continuous-wave fundamental-wavelength pump beam, guided-wave SHG at 532 nm are measured with the maximum power of 0.65 mW and 0.48 mW for waveguide splitters (0.67 mW and 0.51 mW for corresponding straight channel waveguides), corresponding to a SH conversion efficiency of approximately ~14.3%/W and 13.9%/W (11.2%/W, 11.3%/W for corresponding straight channel waveguides), respectively. This work paves a way to fabricate compact integrated nonlinear photonic devices in a single chip with beam dividing functions. PMID:26924255

  8. Efficient Second Harmonic Generation in 3D Nonlinear Optical-Lattice-Like Cladding Waveguide Splitters by Femtosecond Laser Inscription.

    PubMed

    Nie, Weijie; Jia, Yuechen; Vázquez de Aldana, Javier R; Chen, Feng

    2016-02-29

    Integrated photonic devices with beam splitting function are intriguing for a broad range of photonic applications. Through optical-lattice-like cladding waveguide structures fabricated by direct femtosecond laser writing, the light propagation can be engineered via the track-confined refractive index profiles, achieving tailored output beam distributions. In this work, we report on the fabrication of 3D laser-written optical-lattice-like structures in a nonlinear KTP crystal to implement 1 × 4 beam splitting. Second harmonic generation (SHG) of green light through these nonlinear waveguide beam splitter structures provides the capability for the compact visible laser emitting devices. With Type II phase matching of the fundamental wavelength (@ 1064 nm) to second harmonic waves (@ 532 nm), the frequency doubling has been achieved through this three-dimensional beam splitter. Under 1064-nm continuous-wave fundamental-wavelength pump beam, guided-wave SHG at 532 nm are measured with the maximum power of 0.65 mW and 0.48 mW for waveguide splitters (0.67 mW and 0.51 mW for corresponding straight channel waveguides), corresponding to a SH conversion efficiency of approximately ~14.3%/W and 13.9%/W (11.2%/W, 11.3%/W for corresponding straight channel waveguides), respectively. This work paves a way to fabricate compact integrated nonlinear photonic devices in a single chip with beam dividing functions.

  9. Superconductivity in the system Mo{sub x}C{sub y}Ga{sub z}O{sub δ} prepared by focused ion beam induced deposition

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Weirich, P. M., E-mail: p.weirich@Physik.uni-frankfurt.de; Schwalb, C. H.; Winhold, M.

    2014-05-07

    We have prepared the new amorphous superconductor Mo{sub x}C{sub y}Ga{sub z}O{sub δ} with a maximum critical temperature T{sub c} of 3.8 K by the direct-write nano-patterning technique of focused (gallium) ion beam induced deposition (FIBID) using Mo(CO){sub 6} as precursor gas. From a detailed analysis of the temperature-dependent resistivity and the upper critical field, we found clear evidence for proximity of the samples to a disorder-induced metal-insulator transition. We observed a strong dependence of T{sub c} on the deposition parameters and identified clear correlations between T{sub c}, the localization tendency visible in the resistance data and the sample composition. By anmore » in-situ feedback-controlled optimization process in the FIB-induced growth, we were able to identify the beam parameters which lead to samples with the largest T{sub c}-value and sharpest transition into the superconducting state.« less

  10. Stitching-error reduction in gratings by shot-shifted electron-beam lithography

    NASA Technical Reports Server (NTRS)

    Dougherty, D. J.; Muller, R. E.; Maker, P. D.; Forouhar, S.

    2001-01-01

    Calculations of the grating spatial-frequency spectrum and the filtering properties of multiple-pass electron-beam writing demonstrate a tradeoff between stitching-error suppression and minimum pitch separation. High-resolution measurements of optical-diffraction patterns show a 25-dB reduction in stitching-error side modes.

  11. Field mappers for laser material processing

    NASA Astrophysics Data System (ADS)

    Blair, Paul; Currie, Matthew; Trela, Natalia; Baker, Howard J.; Murphy, Eoin; Walker, Duncan; McBride, Roy

    2016-03-01

    The native shape of the single-mode laser beam used for high power material processing applications is circular with a Gaussian intensity profile. Manufacturers are now demanding the ability to transform the intensity profile and shape to be compatible with a new generation of advanced processing applications that require much higher precision and control. We describe the design, fabrication and application of a dual-optic, beam-shaping system for single-mode laser sources, that transforms a Gaussian laser beam by remapping - hence field mapping - the intensity profile to create a wide variety of spot shapes including discs, donuts, XY separable and rotationally symmetric. The pair of optics transform the intensity distribution and subsequently flatten the phase of the beam, with spot sizes and depth of focus close to that of a diffraction limited beam. The field mapping approach to beam-shaping is a refractive solution that does not add speckle to the beam, making it ideal for use with single mode laser sources, moving beyond the limits of conventional field mapping in terms of spot size and achievable shapes. We describe a manufacturing process for refractive optics in fused silica that uses a freeform direct-write process that is especially suited for the fabrication of this type of freeform optic. The beam-shaper described above was manufactured in conventional UV-fused silica using this process. The fabrication process generates a smooth surface (<1nm RMS), leading to laser damage thresholds of greater than 100J/cm2, which is well matched to high power laser sources. Experimental verification of the dual-optic filed mapper is presented.

  12. Ablation of selected conducting layers by fiber laser

    NASA Astrophysics Data System (ADS)

    Pawlak, Ryszard; Tomczyk, Mariusz; Walczak, Maria

    2014-08-01

    Laser Direct Writing (LDW) are used in the manufacture of electronic circuits, pads, and paths in sub millimeter scale. They can also be used in the sensors systems. Ablative laser writing in a thin functional layer of material deposited on the dielectric substrate is one of the LDW methods. Nowadays functional conductive layers are composed from graphene paint or nanosilver paint, indium tin oxide (ITO), AgHTTM and layers containing carbon nanotubes. Creating conducting structures in transparent layers (ITO, AgHT and carbon nanotubes layers) may have special importance e.g. for flexi electronics. The paper presents research on the fabrication of systems of paths and appropriate pattern systems of paths and selected electronic circuits in AgHTTM and ITO layers deposited on glass and polymer substrates. An influence of parameters of ablative fiber laser treatment in nanosecond regime as well as an influence of scanning mode of laser beam on the pattern fidelity and on electrical parameters of a generated circuit was investigated.

  13. Four-port coupled channel-guide device based on 2D photonic crystal structure

    NASA Astrophysics Data System (ADS)

    Camargo, Edilson A.; Chong, Harold M. H.; De La Rue, Richard M.

    2004-12-01

    We have fabricated and measured a four-port coupled channel-waveguide device using W1 channel waveguides oriented along ΓK directions in a two-dimensional (2D) hole-based planar photonic crystal (PhC) based on silicon-on-insulator (SOI) waveguide material, at operation wavelengths around 1550 nm. 2D FDTD simulations and experimental results are shown and compared. The structure has been designed using a mode conversion approach, combined with coupled-mode concepts. The overall length of the photonic crystal structure is typically about 39 μm and the structure has been fabricated using a combination of direct-write electron-beam lithography (EBL) and dry-etch processing. Devices were measured using a tunable laser with end-fire coupling into the planar structure.

  14. Patterned microstructures formed with MeV Au implantation in Si(1 0 0)

    NASA Astrophysics Data System (ADS)

    Rout, Bibhudutta; Greco, Richard R.; Zachry, Daniel P.; Dymnikov, Alexander D.; Glass, Gary A.

    2006-09-01

    Energetic (MeV) Au implantation in Si(1 0 0) (n-type) through masked micropatterns has been used to create layers resistant to KOH wet etching. Microscale patterns were produced in PMMA and SU(8) resist coatings on the silicon substrates using P-beam writing and developed. The silicon substrates were subsequently exposed using 1.5 MeV Au 3+ ions with fluences as high as 1 × 10 16 ions/cm 2 and additional patterns were exposed using copper scanning electron microscope calibration grids as masks on the silicon substrates. When wet etched with KOH microstructures were created in the silicon due to the resistance to KOH etching cause by the Au implantation. The process of combining the fabrication of masked patterns with P-beam writing with broad beam Au implantation through the masks can be a promising, cost-effective process for nanostructure engineering with Si.

  15. Development of economic MeV-ion microbeam technology at Chiang Mai University

    NASA Astrophysics Data System (ADS)

    Singkarat, S.; Puttaraksa, N.; Unai, S.; Yu, L. D.; Singkarat, K.; Pussadee, N.; Whitlow, H. J.; Natyanum, S.; Tippawan, U.

    2017-08-01

    Developing high technologies but in economic manners is necessary and also feasible for developing countries. At Chiang Mai University, Thailand, we have developed MeV-ion microbeam technology based on a 1.7-MV Tandetron tandem accelerator with our limited resources in a cost-effective manner. Instead of using expensive and technically complex electrostatic or magnetic quadrupole focusing lens systems, we have developed cheap MeV-ion microbeams using programmed L-shaped blade aperture and capillary techniques for MeV ion beam lithography or writing and mapping. The programmed L-shaped blade micro-aperture system consists of a pair of L-shaped movable aperture pieces which are controlled by computer to cut off the ion beam for controlling the beam size down to the micrometer order. The capillary technique utilizes our home-fabricated tapered glass capillaries to realize microbeams. Either system can be installed inside the endstation of the MeV ion beam line of the accelerator. Both systems have been applied to MeV-ion beam lithography or writing of micro-patterns for microfluidics applications to fabricate lab-on-chip devices. The capillary technique is being developed for MeV-ion beam mapping of biological samples. The paper reports details of the techniques and introduces some applications.

  16. Mirror writing in pre-school children: a pilot study.

    PubMed

    Cubelli, Roberto; Della Sala, Sergio

    2009-05-01

    Mirror writing refers to the production of individual letters, whole words or sentences in reverse direction. Unintentional mirror writing has been observed in young children learning to write and interpreted as the manifestation of different cognitive impairments. We report on mirror writing instances in a sample of 108 pre-school children. Results showed MW to be age-related but independent from handedness and left-right discrimination abilities. We propose an account of mirror writing as reflecting dissociation between acquired motor programmes for letter shape composition and unspecified spatial direction of hand movements. Before learning to write, the child's directional cognitive system is assumed to be dichotomous, thus inducing the production of randomly oriented asymmetrical letters.

  17. Chalcogenide phase-change thin films used as grayscale photolithography materials.

    PubMed

    Wang, Rui; Wei, Jingsong; Fan, Yongtao

    2014-03-10

    Chalcogenide phase-change thin films are used in many fields, such as optical information storage and solid-state memory. In this work, we present another application of chalcogenide phase-change thin films, i.e., as grayscale photolithgraphy materials. The grayscale patterns can be directly inscribed on the chalcogenide phase-change thin films by a single process through direct laser writing method. In grayscale photolithography, the laser pulse can induce the formation of bump structure, and the bump height and size can be precisely controlled by changing laser energy. Bumps with different height and size present different optical reflection and transmission spectra, leading to the different gray levels. For example, the continuous-tone grayscale images of lifelike bird and cat are successfully inscribed onto Sb(2)Te(3) chalcogenide phase-change thin films using a home-built laser direct writer, where the expression and appearance of the lifelike bird and cat are fully presented. This work provides a way to fabricate complicated grayscale patterns using laser-induced bump structures onto chalcogenide phase-change thin films, different from current techniques such as photolithography, electron beam lithography, and focused ion beam lithography. The ability to form grayscale patterns of chalcogenide phase-change thin films reveals many potential applications in high-resolution optical images for micro/nano image storage, microartworks, and grayscale photomasks.

  18. Magnetic Characterization of Direct-Write Free-Form Building Blocks for Artificial Magnetic 3D Lattices

    PubMed Central

    Al Mamoori, Mohanad K. I.; Keller, Lukas; Pieper, Jonathan; Winkler, Robert; Plank, Harald; Müller, Jens

    2018-01-01

    Three-dimensional (3D) nanomagnetism, where spin configurations extend into the vertical direction of a substrate plane allow for more complex, hierarchical systems and the design of novel magnetic effects. As an important step towards this goal, we have recently demonstrated the direct-write fabrication of freestanding ferromagnetic 3D nano-architectures of ferromagnetic CoFe in shapes of nano-tree and nano-cube structures by means of focused electron beam induced deposition. Here, we present a comprehensive characterization of the magnetic properties of these structures by local stray-field measurements using a high-resolution micro-Hall magnetometer. Measurements in a wide range of temperatures and different angles of the externally applied magnetic field with respect to the surface plane of the sensor are supported by corresponding micromagnetic simulations, which explain the overall switching behavior of in part rather complex magnetization configurations remarkably well. In particular, the simulations yield coercive and switching fields that are in good quantitative correspondence with the measured coercive and switching fields assuming a bulk metal content of 100 at % consisting of bcc Co3Fe. We show that thermally-unstable magnetization states can be repetitively prepared and their lifetime controlled at will, a prerequisite to realizing dynamic and thermally-active magnetic configurations if the building blocks are to be used in lattice structures. PMID:29439553

  19. Suitability of holographic beam scanning in high resolution applications

    NASA Astrophysics Data System (ADS)

    Kalita, Ranjan; Goutam Buddha, S. S.; Boruah, Bosanta R.

    2018-02-01

    The high resolution applications of a laser scanning imaging system very much demand the accurate positioning of the illumination beam. The galvanometer scanner based beam scanning imaging systems, on the other hand, suffer from both short term and long term beam instability issues. Fortunately Computer generated holography based beam scanning offers extremely accurate beam steering, which can be very useful for imaging in high-resolution applications in confocal microscopy. The holographic beam scanning can be achieved by writing a sequence of holograms onto a spatial light modulator and utilizing one of the diffracted orders as the illumination beam. This paper highlights relative advantages of such a holographic beam scanning based confocal system and presents some of preliminary experimental results.

  20. How directional change in reading/writing habits relates to directional change in displayed pictures.

    PubMed

    Lee, Hachoung; Oh, Songjoo

    2016-01-01

    It has been suggested that reading/writing habits may influence the appreciation of pictures. For example, people who read and write in a rightward direction have an aesthetic preference for pictures that face rightward over pictures that face leftward, and vice versa. However, correlations for this phenomenon have only been found in cross-cultural studies. Will a directional change in reading/writing habits within a culture relate to changes in picture preference? Korea is a good place to research this question because the country underwent gradual changes in reading/writing direction habits, from leftward to rightward, during the 20th century. In this study, we analyzed the direction of drawings and photos published in the two oldest newspapers in Korea from 1920-2013. The results show that the direction of the drawings underwent a clear shift from the left to the right, but the direction of the photos did not change. This finding suggests a close psychological link between the habits of reading/writing and drawing that cannot be accounted for simply by an accidental correspondence across different cultures.

  1. All-optical animation projection system with rotating fieldstone.

    PubMed

    Ishii, Yuko; Takayama, Yoshihisa; Kodate, Kashiko

    2007-06-11

    A simple and compact rewritable holographic memory system using a fieldstone of Ulexite is proposed. The role of the fieldstone is to impose random patterns on the reference beam to record plural images with the random-reference multiplexing scheme. The operations for writing and reading holograms are carried out by simply rotating the fieldstone in one direction. One of the features of this approach is found in a way to generate random patterns without computer drawings. The experimental study confirms that our system enables the smooth readout of the stored images one after another so that the series of reproduced images are projected as an animation.

  2. All-optical animation projection system with rotating fieldstone

    NASA Astrophysics Data System (ADS)

    Ishii, Yuko; Takayama, Yoshihisa; Kodate, Kashiko

    2007-06-01

    A simple and compact rewritable holographic memory system using a fieldstone of Ulexite is proposed. The role of the fieldstone is to impose random patterns on the reference beam to record plural images with the random-reference multiplexing scheme. The operations for writing and reading holograms are carried out by simply rotating the fieldstone in one direction. One of the features of this approach is found in a way to generate random patterns without computer drawings. The experimental study confirms that our system enables the smooth readout of the stored images one after another so that the series of reproduced images are projected as an animation.

  3. Magnetic fields and the technology challenges they pose to beam-based equipment: a semiconductor perspective

    NASA Astrophysics Data System (ADS)

    Esqueda, Vincent; Montoya, Julian A.

    2005-08-01

    As semiconductor devices shrink in size to accommodate faster processing speeds, the need for higher resolution beam-based metrology equipment and beam-based writing equipment will increase. The electron and ion beams used within these types of equipment are sensitive to very small variations in magnetic force applied to the beam. This phenomenon results from changes in Alternating Current (AC) and Direct Current (DC) magnetic flux density at the beam column which causes deflections of the beam that can impact equipment performance. Currently the most sensitive beam-based microscope manufacturers require an ambient magnetic field environment that does not have variations that exceed 0.2 milli-Gauss (mG). Studies have shown that such low levels of magnetic flux density can be extremely difficult to achieve. As examples, scissor lifts, vehicles, metal chairs, and doors moving in time and space under typical use conditions can create distortions in the Earth's magnetic field that can exceed 0.2 mG at the beam column. In addition it is known that changes in the Earth's magnetic field caused by solar flares, earthquakes, and variations in the Earth's core itself all cause changes in the magnetic field that can exceed 0.2 mG. This paper will provide the reader with the basic understanding of the emerging problem, will discuss the environmental and facility level challenges associated in meeting such stringent magnetic field environments, will discuss some of the mitigation techniques used to address the problem, and will close by discussing needs for further research in this area to assure semiconductor and nanotechnology industries are pre-positioned for even more stringent magnetic field environmental requirements.

  4. Model-based MPC enables curvilinear ILT using either VSB or multi-beam mask writers

    NASA Astrophysics Data System (ADS)

    Pang, Linyong; Takatsukasa, Yutetsu; Hara, Daisuke; Pomerantsev, Michael; Su, Bo; Fujimura, Aki

    2017-07-01

    Inverse Lithography Technology (ILT) is becoming the choice for Optical Proximity Correction (OPC) of advanced technology nodes in IC design and production. Multi-beam mask writers promise significant mask writing time reduction for complex ILT style masks. Before multi-beam mask writers become the main stream working tools in mask production, VSB writers will continue to be the tool of choice to write both curvilinear ILT and Manhattanized ILT masks. To enable VSB mask writers for complex ILT style masks, model-based mask process correction (MB-MPC) is required to do the following: 1). Make reasonable corrections for complex edges for those features that exhibit relatively large deviations from both curvilinear ILT and Manhattanized ILT designs. 2). Control and manage both Edge Placement Errors (EPE) and shot count. 3. Assist in easing the migration to future multi-beam mask writer and serve as an effective backup solution during the transition. In this paper, a solution meeting all those requirements, MB-MPC with GPU acceleration, will be presented. One model calibration per process allows accurate correction regardless of the target mask writer.

  5. 50 Mb/s, 220-mW Laser-Array Transmitter

    NASA Technical Reports Server (NTRS)

    Cornwell, Donald M., Jr.

    1992-01-01

    Laser transmitter based on injection locking produces single-wavelength, diffraction-limited, single-lobe beam. Output stage is array of laser diodes producing non-diffraction-limited, multi-mode beam in absence of injection locking. Suitable for both free-space and optical-fiber communication systems. Because beam from transmitter focused to spot as small as 5 micrometers, devices usable for reading and writing optical disks at increased information densities. Application also in remote sensing and ranging.

  6. Detecting Submicron Pattern Defects On Optical Photomasks Using An Enhanced El-3 Electron-Beam Lithography Tool

    NASA Astrophysics Data System (ADS)

    Simpson, R. A.; Davis, D. E.

    1982-09-01

    This paper describes techniques to detect submicron pattern defects on optical photomasks with an enhanced direct-write, electron-beam lithographic tool. EL-3 is a third generation, shaped spot, electron-beam lithography tool developed by IBM to fabricate semiconductor devices and masks. This tool is being upgraded to provide 100% inspection of optical photomasks for submicron pattern defects, which are subsequently repaired. Fixed-size overlapped spots are stepped over the mask patterns while a signal derived from the back-scattered electrons is monitored to detect pattern defects. Inspection does not require pattern recognition because the inspection scan patterns are derived from the original design data. The inspection spot is square and larger than the minimum defect to be detected, to improve throughput. A new registration technique provides the beam-to-pattern overlay required to locate submicron defects. The 'guard banding" of inspection shapes prevents mask and system tolerances from producing false alarms that would occur should the spots be mispositioned such that they only partially covered a shape being inspected. A rescanning technique eliminates noise-related false alarms and significantly improves throughput. Data is accumulated during inspection and processed offline, as required for defect repair. EL-3 will detect 0.5 um pattern defects at throughputs compatible with mask manufacturing.

  7. A novel collinear optical system with annulus mirrors for holographic disc driver

    NASA Astrophysics Data System (ADS)

    Wang, Ye

    2008-12-01

    This paper focus on a novel collinear lens system with annulus mirrors for holographic disc driver, both information beam and reference beam are use same laser beam. The expanded and parallel laser beam, center part of it as the information beam then through Fourier transform lens, the beam around center part as a reference beam. On this axis, the ring reference beam reflected by two annulus shaped mirrors, then became a convergent beam, together with the information beam which through the first Fourier transform lens then produce holographic pattern to be write into the holographic disc behind of them, this lens system with two mirrors made the angle between information beam and reference beam more wide, can improved the multiplex level of holographic storage. Pair of Fourier transform lens with advance performance is designed in this paper.

  8. Intregrating metallic wiring with three-dimensional polystyrene colloidal crystals using electron-beam lithography and three-dimensional laser lithography

    NASA Astrophysics Data System (ADS)

    Tian, Yaolan; Isotalo, Tero J.; Konttinen, Mikko P.; Li, Jiawei; Heiskanen, Samuli; Geng, Zhuoran; Maasilta, Ilari J.

    2017-02-01

    We demonstrate a method to fabricate narrow, down to a few micron wide metallic leads on top of a three-dimensional (3D) colloidal crystal self-assembled from polystyrene (PS) nanospheres of diameter 260 nm, using electron-beam lithography. This fabrication is not straightforward due to the fact that PS nanospheres cannot usually survive the harsh chemical treatments required in the development and lift-off steps of electron-beam lithography. We solve this problem by increasing the chemical resistance of the PS nanospheres using an additional electron-beam irradiation step, which allows the spheres to retain their shape and their self-assembled structure, even after baking to a temperature of 160 °C, the exposure to the resist developer and the exposure to acetone, all of which are required for the electron-beam lithography step. Moreover, we show that by depositing an aluminum oxide capping layer on top of the colloidal crystal after the e-beam irradiation, the surface is smooth enough so that continuous metal wiring can be deposited by the electron-beam lithography. Finally, we also demonstrate a way to self-assemble PS colloidal crystals into a microscale container, which was fabricated using direct-write 3D laser-lithography. Metallic wiring was also successfully integrated with the combination of a container structure and a PS colloidal crystal. Our goal is to make a device for studies of thermal transport in 3D phononic crystals, but other phononic or photonic crystal applications could also be envisioned.

  9. Femtosecond laser structuring of silver-containing glass: Silver redistribution, selective etching, and surface topology engineering

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Desmoulin, Jean-Charles; Petit, Yannick; Cardinal, Thierry, E-mail: thierry.cardinal@icmcb.cnrs.fr

    2015-12-07

    Femtosecond direct laser writing in silver-containing phosphate glasses allows for the three-dimensional (3D) implementation of complex photonic structures. Sample translation along or perpendicular to the direction of the beam propagation has been performed, which led to the permanent formation of fluorescent structures, either corresponding to a tubular shape or to two parallel planes at the vicinity of the interaction voxel, respectively. These optical features are related to significant modifications of the local material chemistry. Indeed, silver depletion areas with a diameter below 200 nm were evidenced at the center of the photo-produced structures while photo-produced luminescence properties are attributed to themore » formation of silver clusters around the multiphoton interaction voxel. The laser-triggered oxidation-reduction processes and the associated photo-induced silver redistribution are proposed to be at the origin of the observed original 3D luminescent structures. Thanks to such material structuring, surface engineering has been also demonstrated. Selective surface chemical etching of the glass has been obtained subsequently to laser writing at the location of the photo-produced structures, revealing features with nanometric depth profiles and radial dimensions strongly related to the spatial distributions of the silver clusters.« less

  10. Photonic guiding structures in lithium niobate crystals produced by energetic ion beams

    NASA Astrophysics Data System (ADS)

    Chen, Feng

    2009-10-01

    A range of ion beam techniques have been used to fabricate a variety of photonic guiding structures in the well-known lithium niobate (LiNbO3 or LN) crystals that are of great importance in integrated photonics/optics. This paper reviews the up-to-date research progress of ion-beam-processed LiNbO3 photonic structures and reports on their fabrication, characterization, and applications. Ion beams are being used with this material in a wide range of techniques, as exemplified by the following examples. Ion beam milling/etching can remove the selected surface regions of LiNbO3 crystals via the sputtering effects. Ion implantation and swift ion irradiation can form optical waveguide structures by modifying the surface refractive indices of the LiNbO3 wafers. Crystal ion slicing has been used to obtain bulk-quality LiNbO3 single-crystalline thin films or membranes by exfoliating the implanted layer from the original substrate. Focused ion beams can either generate small structures of micron or submicron dimensions, to realize photonic bandgap crystals in LiNbO3, or directly write surface waveguides or other guiding devices in the crystal. Ion beam-enhanced etching has been extensively applied for micro- or nanostructuring of LiNbO3 surfaces. Methods developed to fabricate a range of photonic guiding structures in LiNbO3 are introduced. Modifications of LiNbO3 through the use of various energetic ion beams, including changes in refractive index and properties related to the photonic guiding structures as well as to the materials (i.e., electro-optic, nonlinear optic, luminescent, and photorefractive features), are overviewed in detail. The application of these LiNbO3 photonic guiding structures in both micro- and nanophotonics are briefly summarized.

  11. Multiple beam mask writers: an industry solution to the write time crisis

    NASA Astrophysics Data System (ADS)

    Litt, Lloyd C.

    2010-09-01

    The semiconductor industry is under constant pressure to reduce production costs even as technology complexity increases. Lithography represents the most expensive process due to its high capital equipment costs and the implementation of low-k1 lithographic processes, which has added to the complexity of making masks through the greater use of optical proximity correction, pixelated masks, and double or triple patterning. Each of these mask technologies allows the production of semiconductors at future nodes while extending the utility of current immersion tools. Low k1 patterning complexity combined with increased data due to smaller feature sizes is driving extremely long mask write times. While a majority of the industry is willing to accept mask write times of up to 24 hours, evidence suggests that the write times for many masks at the 22 nm node and beyond will be significantly longer. It has been estimated that $50M+ in non-recurring engineering (NRE) costs will be required to develop a multiple beam mask writer system, yet the business case to recover this kind of investment is not strong. Moreover, funding such a development is a high risk for an individual supplier. The problem is compounded by a disconnect between the tool customer (the mask supplier) and the final mask customer that will bear the increased costs if a high speed writer is not available. Since no individual company will likely risk entering this market, some type of industry-wide funding model will be needed. Because SEMATECH's member companies strongly support a multiple beam technology for mask writers to reduce the write time and cost of 193 nm and EUV masks, SEMATECH plans to pursue an advanced mask writer program in 2011 and 2012. In 2010, efforts will focus on identifying a funding model to address the investment to develop such a technology.

  12. Imaging the equilibrium state and magnetization dynamics of partially built hard disk write heads

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Valkass, R. A. J., E-mail: rajv202@ex.ac.uk; Yu, W.; Shelford, L. R.

    Four different designs of partially built hard disk write heads with a yoke comprising four repeats of NiFe (1 nm)/CoFe (50 nm) were studied by both x-ray photoemission electron microscopy (XPEEM) and time-resolved scanning Kerr microscopy (TRSKM). These techniques were used to investigate the static equilibrium domain configuration and the magnetodynamic response across the entire structure, respectively. Simulations and previous TRSKM studies have made proposals for the equilibrium domain configuration of similar structures, but no direct observation of the equilibrium state of the writers has yet been made. In this study, static XPEEM images of the equilibrium state of writer structures weremore » acquired using x-ray magnetic circular dichroism as the contrast mechanism. These images suggest that the crystalline anisotropy dominates the equilibrium state domain configuration, but competition with shape anisotropy ultimately determines the stability of the equilibrium state. Dynamic TRSKM images were acquired from nominally identical devices. These images suggest that a longer confluence region may hinder flux conduction from the yoke into the pole tip: the shorter confluence region exhibits clear flux beaming along the symmetry axis, whereas the longer confluence region causes flux to conduct along one edge of the writer. The observed variations in dynamic response agree well with the differences in the equilibrium magnetization configuration visible in the XPEEM images, confirming that minor variations in the geometric design of the writer structure can have significant effects on the process of flux beaming.« less

  13. 1D design style implications for mask making and CEBL

    NASA Astrophysics Data System (ADS)

    Smayling, Michael C.

    2013-09-01

    At advanced nodes, CMOS logic is being designed in a highly regular design style because of the resolution limitations of optical lithography equipment. Logic and memory layouts using 1D Gridded Design Rules (GDR) have been demonstrated to nodes beyond 12nm.[1-4] Smaller nodes will require the same regular layout style but with multiple patterning for critical layers. One of the significant advantages of 1D GDR is the ease of splitting layouts into lines and cuts. A lines and cuts approach has been used to achieve good pattern fidelity and process margin to below 12nm.[4] Line scaling with excellent line-edge roughness (LER) has been demonstrated with self-aligned spacer processing.[5] This change in design style has important implications for mask making: • The complexity of the masks will be greatly reduced from what would be required for 2D designs with very complex OPC or inverse lithography corrections. • The number of masks will initially increase, as for conventional multiple patterning. But in the case of 1D design, there are future options for mask count reduction. • The line masks will remain simple, with little or no OPC, at pitches (1x) above 80nm. This provides an excellent opportunity for continual improvement of line CD and LER. The line pattern will be processed through a self-aligned pitch division sequence to divide pitch by 2 or by 4. • The cut masks can be done with "simple OPC" as demonstrated to beyond 12nm.[6] Multiple simple cut masks may be required at advanced nodes. "Coloring" has been demonstrated to below 12nm for two colors and to 8nm for three colors. • Cut/hole masks will eventually be replaced by e-beam direct write using complementary e-beam lithography (CEBL).[7-11] This transition is gated by the availability of multiple column e-beam systems with throughput adequate for high- volume manufacturing. A brief description of 1D and 2D design styles will be presented, followed by examples of 1D layouts. Mask complexity for 1D layouts patterned directly will be compared to mask complexity for lines and cuts at nodes larger than 20nm. No such comparison is possible below 20nm since single-patterning does not work below ~80nm pitch using optical exposure tools. Also discussed will be recently published wafer results for line patterns with pitch division by-2 and by-4 at sub-12nm nodes, plus examples of post-etch results for 1D patterns done with cut masks and compared to cuts exposed by a single-column e-beam direct write system.

  14. Inert gas enhanced laser-assisted purification of platinum electron-beam-induced deposits

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Stanford, Michael G.; Lewis, Brett B.; Noh, Joo Hyon

    Electron-beam-induced deposition patterns, with composition of PtC 5, were purified using a pulsed laser-induced purification reaction to erode the amorphous carbon matrix and form pure platinum deposits. Enhanced mobility of residual H 2O molecules via a localized injection of inert Ar–H 2 (4%) is attributed to be the reactive gas species for purification of the deposits. Surface purification of deposits was realized at laser exposure times as low as 0.1 s. The ex situ purification reaction in the deposit interior was shown to be rate-limited by reactive gas diffusion into the deposit, and deposit contraction associated with the purification processmore » caused some loss of shape retention. To circumvent the intrinsic flaws of the ex situ anneal process, in situ deposition and purification techniques were explored that resemble a direct write atomic layer deposition (ALD) process. First, we explored a laser-assisted electron-beam-induced deposition (LAEBID) process augmented with reactive gas that resulted in a 75% carbon reduction compared to standard EBID. Lastly, a sequential deposition plus purification process was also developed and resulted in deposition of pure platinum deposits with high fidelity and shape retention.« less

  15. Focused helium-ion beam irradiation effects on electrical transport properties of few-layer WSe 2: Enabling nanoscale direct write homo-junctions

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Stanford, Michael; Noh, Joo Hyon; Koehler, Michael R.

    Atomically thin transition metal dichalcogenides (TMDs) are currently receiving significant attention due to their promising opto-electronic properties. Tuning optical and electrical properties of mono and few-layer TMDs, such as tungsten diselenide (WSe 2), by controlling the defects, is an intriguing opportunity to synthesize next generation two dimensional material opto-electronic devices. Here, we report the effects of focused helium ion beam irradiation on the structural, optical and electrical properties of few-layer WSe 2, via high resolution scanning transmission electron microscopy, Raman spectroscopy, and electrical transport measurements. By controlling the ion irradiation dose, we selectively introduce precise defects in few-layer WSe 2more » thereby locally tuning the resistivity and transport properties of the material. Hole transport in the few layer WSe 2 is degraded more severely relative to electron transport after helium ion irradiation. Moreover, by selectively exposing material with the ion beam, we demonstrate a simple yet highly tunable method to create lateral homo-junctions in few layer WSe 2 flakes, which constitutes an important advance towards two dimensional opto-electronic devices.« less

  16. Focused helium-ion beam irradiation effects on electrical transport properties of few-layer WSe 2: Enabling nanoscale direct write homo-junctions

    DOE PAGES

    Stanford, Michael; Noh, Joo Hyon; Koehler, Michael R.; ...

    2016-06-06

    Atomically thin transition metal dichalcogenides (TMDs) are currently receiving significant attention due to their promising opto-electronic properties. Tuning optical and electrical properties of mono and few-layer TMDs, such as tungsten diselenide (WSe 2), by controlling the defects, is an intriguing opportunity to synthesize next generation two dimensional material opto-electronic devices. Here, we report the effects of focused helium ion beam irradiation on the structural, optical and electrical properties of few-layer WSe 2, via high resolution scanning transmission electron microscopy, Raman spectroscopy, and electrical transport measurements. By controlling the ion irradiation dose, we selectively introduce precise defects in few-layer WSe 2more » thereby locally tuning the resistivity and transport properties of the material. Hole transport in the few layer WSe 2 is degraded more severely relative to electron transport after helium ion irradiation. Moreover, by selectively exposing material with the ion beam, we demonstrate a simple yet highly tunable method to create lateral homo-junctions in few layer WSe 2 flakes, which constitutes an important advance towards two dimensional opto-electronic devices.« less

  17. Inert gas enhanced laser-assisted purification of platinum electron-beam-induced deposits

    DOE PAGES

    Stanford, Michael G.; Lewis, Brett B.; Noh, Joo Hyon; ...

    2015-06-30

    Electron-beam-induced deposition patterns, with composition of PtC 5, were purified using a pulsed laser-induced purification reaction to erode the amorphous carbon matrix and form pure platinum deposits. Enhanced mobility of residual H 2O molecules via a localized injection of inert Ar–H 2 (4%) is attributed to be the reactive gas species for purification of the deposits. Surface purification of deposits was realized at laser exposure times as low as 0.1 s. The ex situ purification reaction in the deposit interior was shown to be rate-limited by reactive gas diffusion into the deposit, and deposit contraction associated with the purification processmore » caused some loss of shape retention. To circumvent the intrinsic flaws of the ex situ anneal process, in situ deposition and purification techniques were explored that resemble a direct write atomic layer deposition (ALD) process. First, we explored a laser-assisted electron-beam-induced deposition (LAEBID) process augmented with reactive gas that resulted in a 75% carbon reduction compared to standard EBID. Lastly, a sequential deposition plus purification process was also developed and resulted in deposition of pure platinum deposits with high fidelity and shape retention.« less

  18. Photonic crystal fibre for industrial laser delivery

    NASA Astrophysics Data System (ADS)

    O'Driscoll, E. J.; McDonald, J.; Morgan, S.; Simpson, G.; Sidhu, J.; Baggett, J. C.; Hayes, J. R.; Petrovich, M. N.; Finazzi, V.; Polletti, F.; Richardson, D. J.; Horley, R.; Harker, A.; Grunewald, P.; Allott, R.; Judd, E.

    2006-12-01

    Fiber delivery of intense laser radiation is important for a broad range of application sectors, from medicine through to industrial laser processing of materials, and offers many practical system benefits relative to free space solutions. In recent years, photonic crystal fiber technology has revolutionized the dynamic field of optical fibers, bringing with them a wide range of novel optical properties that make them ideally suited to power delivery with unparalleled control over the beam properties. The DTI funded project: Photonic Fibers for Industrial beam DELivery (PFIDEL), aims to develop novel fiber geometries for use as a delivery system for high power industrial lasers and to assess their potential in a range of "real" industrial applications. In this paper we review, from an industrial laser user perspective, the advantages of each of the fibers studied under PFIDEL. We present results of application demonstrations and discuss how these fibers can positively impact the field of industrial laser systems and processes, in particular for direct write and micromachining applications.

  19. Additive direct-write microfabrication for MEMS: A review

    NASA Astrophysics Data System (ADS)

    Teh, Kwok Siong

    2017-12-01

    Direct-write additive manufacturing refers to a rich and growing repertoire of well-established fabrication techniques that builds solid objects directly from computer- generated solid models without elaborate intermediate fabrication steps. At the macroscale, direct-write techniques such as stereolithography, selective laser sintering, fused deposition modeling ink-jet printing, and laminated object manufacturing have significantly reduced concept-to-product lead time, enabled complex geometries, and importantly, has led to the renaissance in fabrication known as the maker movement. The technological premises of all direct-write additive manufacturing are identical—converting computer generated three-dimensional models into layers of two-dimensional planes or slices, which are then reconstructed sequentially into threedimensional solid objects in a layer-by-layer format. The key differences between the various additive manufacturing techniques are the means of creating the finished layers and the ancillary processes that accompany them. While still at its infancy, direct-write additive manufacturing techniques at the microscale have the potential to significantly lower the barrier-of-entry—in terms of cost, time and training—for the prototyping and fabrication of MEMS parts that have larger dimensions, high aspect ratios, and complex shapes. In recent years, significant advancements in materials chemistry, laser technology, heat and fluid modeling, and control systems have enabled additive manufacturing to achieve higher resolutions at the micrometer and nanometer length scales to be a viable technology for MEMS fabrication. Compared to traditional MEMS processes that rely heavily on expensive equipment and time-consuming steps, direct-write additive manufacturing techniques allow for rapid design-to-prototype realization by limiting or circumventing the need for cleanrooms, photolithography and extensive training. With current direct-write additive manufacturing technologies, it is possible to fabricate unsophisticated micrometer scale structures at adequate resolutions and precisions using materials that range from polymers, metals, ceramics, to composites. In both academia and industry, direct-write additive manufacturing offers extraordinary promises to revolutionize research and development in microfabrication and MEMS technologies. Importantly, direct-write additive manufacturing could appreciably augment current MEMS fabrication technologies, enable faster design-to-product cycle, empower new paradigms in MEMS designs, and critically, encourage wider participation in MEMS research at institutions or for individuals with limited or no access to cleanroom facilities. This article aims to provide a limited review of the current landscape of direct-write additive manufacturing techniques that are potentially applicable for MEMS microfabrication.

  20. Designing to win in sub-90nm mask production

    NASA Astrophysics Data System (ADS)

    Zhang, Yuan

    2005-11-01

    An informal survey conducted with key customers by Photronics indicates that the time gap between technology nodes has accelerated in recent years. Previously the cycle was three years. However, between 130nm and 90nm there was less than a 2 year gap, and between 90nm and 65nm a 1.5 year gap exists. As a result, the technical challenges have increased substantially. In addition, mask costs are rising exponentially due to high capital equipment cost, a shrinking customer base, long write times and increased applications of 193nm EAPSM or AAPSM. Collaboration among EDA companies, mask houses and wafer manufacturers is now more important than ever. This paper will explore avenues for reducing mask costs, mainly in the areas of: write-time reduction through design for manufacturing (DFM), and yield improvement through specification relaxation. Our study conducted through layout vertex modeling suggests that a simple design shape such as a square versus a circle or an angled structure helps reduce shot count and write time. Shot count reduction through mask layout optimization, and advancement in new generation E-beam writers can reduce write time up to 65%. An advanced laser writer can produce those less critical E-beam layers in less than half the time of an e-beam writer. Additionally, the emerging imprint lithography brings new life and new challenges to the photomask industry with applications in many fields outside of the semiconductor industry. As immersion lithography is introduced for 45nm device production, polarization and MEEF effects due to the mask will become severe. Larger magnification not only provides benefits on CD control and MEEF, but also extends the life time of current 90nm/65nm tool sets where 45nm mask sets can be produced at a lower cost.

  1. Expanding the Developmental Models of Writing: A Direct and Indirect Effects Model of Developmental Writing (DIEW)

    ERIC Educational Resources Information Center

    Kim, Young-Suk Grace; Schatschneider, Christopher

    2017-01-01

    We investigated direct and indirect effects of component skills on writing (DIEW) using data from 193 children in Grade 1. In this model, working memory was hypothesized to be a foundational cognitive ability for language and cognitive skills as well as transcription skills, which, in turn, contribute to writing. Foundational oral language skills…

  2. Ultrafast graphene and carbon nanotube film patterning by picosecond laser pulses

    NASA Astrophysics Data System (ADS)

    Bobrinetskiy, Ivan I.; Emelianov, Alexey V.; Otero, Nerea; Romero, Pablo M.

    2016-03-01

    Carbon nanomaterials is among the most promising technologies for advanced electronic applications, due to their extraordinary chemical and physical properties. Nonetheless, after more than two decades of intensive research, the application of carbon-based nanostructures in real electronic and optoelectronic devices is still a big challenge due to lack of scalable integration in microelectronic manufacturing. Laser processing is an attractive tool for graphene device manufacturing, providing a large variety of processes through direct and indirect interaction of laser beams with graphene lattice: functionalization, oxidation, reduction, etching and ablation, growth, etc. with resolution down to the nanoscale. Focused laser radiation allows freeform processing, enabling fully mask-less fabrication of devices from graphene and carbon nanotube films. This concept is attractive to reduce costs, improve flexibility, and reduce alignment operations, by producing fully functional devices in single direct-write operations. In this paper, a picosecond laser with a wavelength of 515 nm and pulse width of 30 ps is used to pattern carbon nanostructures in two ways: ablation and chemical functionalization. The light absorption leads to thermal ablation of graphene and carbon nanotube film under the fluence 60-90 J/cm2 with scanning speed up to 2 m/s. Just under the ablation energy, the two-photon absorption leads to add functional groups to the carbon lattice which change the optical properties of graphene. This paper shows the results of controlled modification of geometrical configuration and the physical and chemical properties of carbon based nanostructures, by laser direct writing.

  3. Electron Beam-Induced Writing of Nanoscale Iron Wires on a Functional Metal Oxide

    PubMed Central

    2013-01-01

    Electron beam-induced surface activation (EBISA) has been used to grow wires of iron on rutile TiO2(110)-(1 × 1) in ultrahigh vacuum. The wires have a width down to ∼20 nm and hence have potential utility as interconnects on this dielectric substrate. Wire formation was achieved using an electron beam from a scanning electron microscope to activate the surface, which was subsequently exposed to Fe(CO)5. On the basis of scanning tunneling microscopy and Auger electron spectroscopy measurements, the activation mechanism involves electron beam-induced surface reduction and restructuring. PMID:24159366

  4. Elimination of a Photovoltaic Induced Fast Instability in Photorefractive Iron-doped Lithium Niobate Crystals

    NASA Astrophysics Data System (ADS)

    Evans, D. R.; Saleh, M. A.; Allen, A. S.; Pottenger, T. P.; Bunning, T. J.; Guha, S.; Basun, S. A.; Cook, G.

    2002-03-01

    An instability on the order of 10 ns is observed while writing volume gratings in bulk crystals of iron-doped lithium niobate using contra-directional two-beam coupling along the c-axis. This instability is attributed to the quasi-breakdown of the uniform component of the photovoltaic field [1], which affects the uniform electric field formed inside the crystal causing a change in the refractive index through the electro-optic effect. A method to eliminate this instability by coating the z-surfaces of the crystal with a transparent conductive coating will be presented. [1] A. Krumins, Z. Chen, and T. Shiosaki, Opt. Comm. 117 (1995) 147-150.

  5. Rapid assessment of nonlinear optical propagation effects in dielectrics

    PubMed Central

    Hoyo, J. del; de la Cruz, A. Ruiz; Grace, E.; Ferrer, A.; Siegel, J.; Pasquazi, A.; Assanto, G.; Solis, J.

    2015-01-01

    Ultrafast laser processing applications need fast approaches to assess the nonlinear propagation of the laser beam in order to predict the optimal range of processing parameters in a wide variety of cases. We develop here a method based on the simple monitoring of the nonlinear beam shaping against numerical prediction. The numerical code solves the nonlinear Schrödinger equation with nonlinear absorption under simplified conditions by employing a state-of-the art computationally efficient approach. By comparing with experimental results we can rapidly estimate the nonlinear refractive index and nonlinear absorption coefficients of the material. The validity of this approach has been tested in a variety of experiments where nonlinearities play a key role, like spatial soliton shaping or fs-laser waveguide writing. The approach provides excellent results for propagated power densities for which free carrier generation effects can be neglected. Above such a threshold, the peculiarities of the nonlinear propagation of elliptical beams enable acquiring an instantaneous picture of the deposition of energy inside the material realistic enough to estimate the effective nonlinear refractive index and nonlinear absorption coefficients that can be used for predicting the spatial distribution of energy deposition inside the material and controlling the beam in the writing process. PMID:25564243

  6. Rapid assessment of nonlinear optical propagation effects in dielectrics.

    PubMed

    del Hoyo, J; de la Cruz, A Ruiz; Grace, E; Ferrer, A; Siegel, J; Pasquazi, A; Assanto, G; Solis, J

    2015-01-07

    Ultrafast laser processing applications need fast approaches to assess the nonlinear propagation of the laser beam in order to predict the optimal range of processing parameters in a wide variety of cases. We develop here a method based on the simple monitoring of the nonlinear beam shaping against numerical prediction. The numerical code solves the nonlinear Schrödinger equation with nonlinear absorption under simplified conditions by employing a state-of-the art computationally efficient approach. By comparing with experimental results we can rapidly estimate the nonlinear refractive index and nonlinear absorption coefficients of the material. The validity of this approach has been tested in a variety of experiments where nonlinearities play a key role, like spatial soliton shaping or fs-laser waveguide writing. The approach provides excellent results for propagated power densities for which free carrier generation effects can be neglected. Above such a threshold, the peculiarities of the nonlinear propagation of elliptical beams enable acquiring an instantaneous picture of the deposition of energy inside the material realistic enough to estimate the effective nonlinear refractive index and nonlinear absorption coefficients that can be used for predicting the spatial distribution of energy deposition inside the material and controlling the beam in the writing process.

  7. Rapid assessment of nonlinear optical propagation effects in dielectrics

    NASA Astrophysics Data System (ADS)

    Hoyo, J. Del; de La Cruz, A. Ruiz; Grace, E.; Ferrer, A.; Siegel, J.; Pasquazi, A.; Assanto, G.; Solis, J.

    2015-01-01

    Ultrafast laser processing applications need fast approaches to assess the nonlinear propagation of the laser beam in order to predict the optimal range of processing parameters in a wide variety of cases. We develop here a method based on the simple monitoring of the nonlinear beam shaping against numerical prediction. The numerical code solves the nonlinear Schrödinger equation with nonlinear absorption under simplified conditions by employing a state-of-the art computationally efficient approach. By comparing with experimental results we can rapidly estimate the nonlinear refractive index and nonlinear absorption coefficients of the material. The validity of this approach has been tested in a variety of experiments where nonlinearities play a key role, like spatial soliton shaping or fs-laser waveguide writing. The approach provides excellent results for propagated power densities for which free carrier generation effects can be neglected. Above such a threshold, the peculiarities of the nonlinear propagation of elliptical beams enable acquiring an instantaneous picture of the deposition of energy inside the material realistic enough to estimate the effective nonlinear refractive index and nonlinear absorption coefficients that can be used for predicting the spatial distribution of energy deposition inside the material and controlling the beam in the writing process.

  8. CA resist with high sensitivity and sub-100-nm resolution for advanced mask making

    NASA Astrophysics Data System (ADS)

    Huang, Wu-Song; Kwong, Ranee W.; Hartley, John G.; Moreau, Wayne M.; Angelopoulos, Marie; Magg, Christopher; Lawliss, Mark

    2000-07-01

    Recently, there is significant interest in using CA resist for electron beam (E-beam) applications including mask making, direct write, and projection printing. CA resists provide superior lithographic performance in comparison to traditional non-CA E-beam resist in particular high contrast, resolution, and sensitivity. However, most of the commercially available CA resist have the concern of airborne base contaminants and sensitivity to PAB and/or PEB temperatures. In this presentation, we will discuss a new improved ketal resists system referred to as KRS-XE which exhibits excellent lithography, is robust toward airborne base, compatible with 0.263N TMAH aqueous developer and exhibits excellent lithography, is robust toward airborne base, compatible with 0.263N TMAH aqueous developer and exhibits a large PAB/PEB latitude. With the combination of a high performance mask making E-beam exposure tool, high kV shaped beam system EL4+ and the KRS-XE resist, we have printed 75nm lines/space feature with excellent profile control at a dose of 13(mu) C/cm2 at 75kV. The shaped beam vector scan system used here provides a unique property in resolving small features in lithography and throughput. Overhead in EL4+$ limits the systems ability to fully exploit the sensitivity of the new resist for throughput. The EL5 system has sufficiently low overhead that it is projected to print a 4X, 16G DRAM mask with OPC in under 3 hours with the CA resist. We will discuss the throughput advantages of the next generation EL5 system over the existing EL4+.

  9. Cavity Solitons in Vertical Cavity Surface Emitting Lasers and their Applications

    NASA Astrophysics Data System (ADS)

    Giudici, Massimo; Pedaci, Francesco; Caboche, Emilie; Genevet, Patrice; Barland, Stephane; Tredicce, Jorge; Tissoni, Giovanna; Lugiato, Luigi

    Cavity solitons (CS) are single peak localized structures which form over a homogeneous background in the section of broad-area non linear resonator driven by a coherent holding beam. They can be switched on and off by shining a writing/ erasing local laser pulse into the optical cavity. Moreover, when a phase or amplitude gradient is introduced in the holding beam, CS are set in motion along the gradient with a speed that depends on gradient strength. The ability to address CS and to control their location as well as their motion makes them interesting for alloptical processing units. In this chapter we report on several functionalities of CS that have been experimentally implemented in a Vertical Cavity Surface Emitting Laser (VCSEL) biased below threshold. We show that CS positions in the transverse section of the resonator can be reconfigured according to a phase landscape introduced in the holding beam. CS drifting propelled by a phase gradient in the holding beam can be used for realizing an all-optical delay line. Information bits are written in form of CS at a point of the device and a time delayed version of the written information can be read elsewhere along the gradient direction. CS existence and functionalities are deeply affected by presence of device defects generated during the fabrication process and randomly distributed through the device section. The sensitivity of CS to parameters gradients can be used to probe these defects, otherwise not detectable, and mapping their positions. Finally, a periodic flow of moving CS can be obtained by the interplay between a device defect and an external parameter gradient. This suggests the possibility of engineering a CS source directly onto the device.

  10. Focused-electron-beam-induced processing (FEBIP) for emerging applications in carbon nanoelectronics

    NASA Astrophysics Data System (ADS)

    Fedorov, Andrei G.; Kim, Songkil; Henry, Mathias; Kulkarni, Dhaval; Tsukruk, Vladimir V.

    2014-12-01

    Focused-electron-beam-induced processing (FEBIP), a resist-free additive nanomanufacturing technique, is an actively researched method for "direct-write" processing of a wide range of structural and functional nanomaterials, with high degree of spatial and time-domain control. This article attempts to critically assess the FEBIP capabilities and unique value proposition in the context of processing of electronics materials, with a particular emphasis on emerging carbon (i.e., based on graphene and carbon nanotubes) devices and interconnect structures. One of the major hurdles in advancing the carbon-based electronic materials and device fabrication is a disjoint nature of various processing steps involved in making a functional device from the precursor graphene/CNT materials. Not only this multi-step sequence severely limits the throughput and increases the cost, but also dramatically reduces the processing reproducibility and negatively impacts the quality because of possible between-the-step contamination, especially for impurity-susceptible materials such as graphene. The FEBIP provides a unique opportunity to address many challenges of carbon nanoelectronics, especially when it is employed as part of an integrated processing environment based on multiple "beams" of energetic particles, including electrons, photons, and molecules. This avenue is promising from the applications' prospective, as such a multi-functional (electron/photon/molecule beam) enables one to define shapes (patterning), form structures (deposition/etching), and modify (cleaning/doping/annealing) properties with locally resolved control on nanoscale using the same tool without ever changing the processing environment. It thus will have a direct positive impact on enhancing functionality, improving quality and reducing fabrication costs for electronic devices, based on both conventional CMOS and emerging carbon (CNT/graphene) materials.

  11. Direct-Write Printing on Three-Dimensional Geometries for Miniaturized Detector and Electronic Assemblies

    NASA Technical Reports Server (NTRS)

    Paquette, Beth; Samuels, Margaret; Chen, Peng

    2017-01-01

    Direct-write printing techniques will enable new detector assemblies that were not previously possible with traditional assembly processes. Detector concepts were manufactured using this technology to validate repeatability. Additional detector applications and printed wires on a 3-dimensional magnetometer bobbin will be designed for print. This effort focuses on evaluating performance for direct-write manufacturing techniques on 3-dimensional surfaces. Direct-write manufacturing has the potential to reduce mass and volume for fabrication and assembly of advanced detector concepts by reducing trace widths down to 10 microns, printing on complex geometries, allowing new electronic concept production, and reduced production times of complex those electronics.

  12. The Impact of the Direct Teacher Feedback Strategy on the EFL Secondary Stage Students' Writing Performance

    ERIC Educational Resources Information Center

    Elashri, Ismail Ibrahim Elshirbini Abdel Fattah

    2013-01-01

    This study aimed at developing some writing skills for second year secondary stage students through the direct teacher feedback strategy. Hence, the problem of the study was stated in the following statement: "The students at Al Azhar secondary schools are not good at writing. As a result their writing skills are weak." They need to be…

  13. Nano-scale optical circuits and self-organized lightwave network (SOLNET) fabricated using sol-gel materials with photo-induced refractive index increase

    NASA Astrophysics Data System (ADS)

    Ono, Shigeru; Yoshimura, Tetsuzo; Sato, Tetsuo; Oshima, Juro

    2009-02-01

    Recently, Nissan Chemical Industries, LTD, developed the photo-induced refractive index variation sol-gel materials, in which the refractive index increases from 1.65 to 1.85 by ultra-violet (UV) light exposure and baking. The materials enable us to fabricate high-index-contract waveguides without developing/etching processes and strong-lightconfinement self-organized lightwave network (SOLNET). Therefore, the materials are expected promising for nanoscale optical circuits with self-alignment capability. Nano-scale optical circuits with core thickness of ~230 nm and core width of ~1 μm were fabricated. Propagation loss was 1.86 dB/cm for TE mode and 1.89 dB/cm for TM mode at 633 nm in wavelength, indicating that there were small polarization dependences. Spot sizes of guided beams along core width direction and along core thickness direction were respectively 0.6 μm and 0.3 μm for both TE and TM mode. Bending loss of S-bending waveguides was reduced from 0.44 dB to 0.24 dB for TE mode with increasing the bending curvature radius from 5 μm to 60 μm. Difference in bending loss between TM and TE mode was less than 10%. Branching loss of Y-branching waveguides was reduced from 1.33 dB to 0.08 dB for TE mode, and from 1.34 dB to 0.12 dB for TM mode with decreasing the branching angle from 80° to 20°. These results indicate that the photoinduced refractive index variation sol-gel materials can realize miniaturized optical circuits with sizes of several tens μm and guided beam confinement within a cross-section area less than 1.0 μm2 with small polarization dependences, suggesting potential applications to intra-chip optical interconnects. In addtion, we fabricated self-organized lightwave network (SOLNET) using the photo-induced refractive index variation sol-gel materials. When write beams of 405 nm in wavelength were introduced into the sol-gel thin film under baking at 200°C, self-focusing was induced, and SOLNET was formed. SOLNET fabricated by low write beam intensity exhibited strong light confinement. Furthermore, SOLNET was found to be drawn automatically to reflective portion such as a defect and a silver paste droplet in the sol-gel thin film during SOLNET formation, indicating that reflective SOLNET is formed. The results suggest that the photo-induced refractive index variation sol-gel materials can provide self-alignment capability to the nano-scale optical circuits.

  14. Laser-based direct-write techniques for cell printing

    PubMed Central

    Schiele, Nathan R; Corr, David T; Huang, Yong; Raof, Nurazhani Abdul; Xie, Yubing; Chrisey, Douglas B

    2016-01-01

    Fabrication of cellular constructs with spatial control of cell location (±5 μm) is essential to the advancement of a wide range of applications including tissue engineering, stem cell and cancer research. Precise cell placement, especially of multiple cell types in co- or multi-cultures and in three dimensions, can enable research possibilities otherwise impossible, such as the cell-by-cell assembly of complex cellular constructs. Laser-based direct writing, a printing technique first utilized in electronics applications, has been adapted to transfer living cells and other biological materials (e.g., enzymes, proteins and bioceramics). Many different cell types have been printed using laser-based direct writing, and this technique offers significant improvements when compared to conventional cell patterning techniques. The predominance of work to date has not been in application of the technique, but rather focused on demonstrating the ability of direct writing to pattern living cells, in a spatially precise manner, while maintaining cellular viability. This paper reviews laser-based additive direct-write techniques for cell printing, and the various cell types successfully laser direct-written that have applications in tissue engineering, stem cell and cancer research are highlighted. A particular focus is paid to process dynamics modeling and process-induced cell injury during laser-based cell direct writing. PMID:20814088

  15. Optical memory development. Volume 1: prototype memory system

    NASA Technical Reports Server (NTRS)

    Cosentino, L. S.; Mezrich, R. S.; Nagle, E. M.; Stewart, W. C.; Wendt, F. S.

    1972-01-01

    The design, development, and implementation of a prototype, partially populated, million bit read-write holographic memory system using state-of-the-art components are described. The system employs an argon ion laser, acoustooptic beam deflectors, a holographic beam splitter (hololens), a nematic liquid crystal page composer, a photoconductor-thermoplastic erasable storage medium, a silicon P-I-N photodiode array, with lenses and electronics of both conventional and custom design. Operation of the prototype memory system was successfully demonstrated. Careful attention is given to the analysis from which the design criteria were developed. Specifications for the major components are listed, along with the details of their construction and performance. The primary conclusion resulting from this program is that the basic principles of read-write holographic memory system are well understood and are reducible to practice.

  16. Expanding the developmental models of writing: A direct and indirect effects model of developmental writing (DIEW)

    PubMed Central

    Kim, Young-Suk Grace; Schatschneider, Christopher

    2016-01-01

    We investigated direct and indirect effects of component skills on writing (DIEW) using data from 193 children in Grade 1. In this model, working memory was hypothesized to be a foundational cognitive ability for language and cognitive skills as well as transcription skills, which, in turn, contribute to writing. Foundational oral language skills (vocabulary and grammatical knowledge) and higher-order cognitive skills (inference and theory of mind) were hypothesized to be component skills of text generation (i.e., discourse-level oral language). Results from structural equation modeling largely supported a complete mediation model among four variations of the DIEW model. Discourse-level oral language, spelling, and handwriting fluency completely mediated the relations of higher-order cognitive skills, foundational oral language, and working memory to writing. Moreover, language and cognitive skills had both direct and indirect relations to discourse-level oral language. Total effects, including direct and indirect effects, were substantial for discourse-level oral language (.46), working memory (.43), and spelling (.37), followed by vocabulary (.19), handwriting (.17), theory of mind (.12), inference (.10), and grammatical knowledge (.10). The model explained approximately 67% of variance in writing quality. These results indicate that multiple language and cognitive skills make direct and indirect contributions, and it is important to consider both direct and indirect pathways of influences when considering skills that are important to writing. PMID:28260812

  17. The role of research-article writing motivation and self-regulatory strategies in explaining research-article abstract writing ability.

    PubMed

    Lin, Ming-Chia; Cheng, Yuh-Show; Lin, Sieh-Hwa; Hsieh, Pei-Jung

    2015-04-01

    The purpose of the study was to investigate the effects of research-article writing motivation and use of self-regulatory writing strategies in explaining second language (L2) research-article abstract writing ability, alongside the L2 literacy effect. Four measures were administered: a L2 literacy test, a research abstract performance assessment, and inventories of writing motivation and strategy. Participants were L2 graduate students in Taiwan (N=185; M age=25.8 yr., SD=4.5, range=22-53). Results of structural equation modeling showed a direct effect of motivation on research-article writing ability, but no direct effect of strategy or indirect effect of motivation via strategy on research-article writing ability, with L2 literacy controlled. The findings suggest research-article writing instruction should address writing motivation, besides L2 literacy.

  18. Separation of submicron bioparticles by dielectrophoresis.

    PubMed Central

    Morgan, H; Hughes, M P; Green, N G

    1999-01-01

    Submicron particles such as latex spheres and viruses can be manipulated and characterized using dielectrophoresis. By the use of appropriate microelectrode arrays, particles can be trapped or moved between regions of high or low electric fields. The magnitude and direction of the dielectrophoretic force on the particle depends on its dielectric properties, so that a heterogeneous mixture of particles can be separated to produce a more homogeneous population. In this paper the controlled separation of submicron bioparticles is demonstrated. With electrode arrays fabricated using direct write electron beam lithography, it is shown that different types of submicron latex spheres can be spatially separated. The separation occurs as a result of differences in magnitude and/or direction of the dielectrophoretic force on different populations of particles. These differences arise mainly because the surface properties of submicron particles dominate their dielectrophoretic behavior. It is also demonstrated that tobacco mosaic virus and herpes simplex virus can be manipulated and spatially separated in a microelectrode array. PMID:10388776

  19. EUV lithography reticles fabricated without the use of a patterned absorber

    DOEpatents

    Stearns, Daniel G.; Sweeney, Donald W.; Mirkarimi, Paul B.

    2006-05-23

    Absorber material used in conventional EUVL reticles is eliminated by introducing a direct modulation in the complex-valued reflectance of the multilayer. A spatially localized energy source such as a focused electron or ion beam directly writes a reticle pattern onto the reflective multilayer coating. Interdiffusion is activated within the film by an energy source that causes the multilayer period to contract in the exposed regions. The contraction is accurately determined by the energy dose. A controllable variation in the phase and amplitude of the reflected field in the reticle plane is produced by the spatial modulation of the multilayer period. This method for patterning an EUVL reticle has the advantages (1) avoiding the process steps associated with depositing and patterning an absorber layer and (2) providing control of the phase and amplitude of the reflected field with high spatial resolution.

  20. Method for fabricating reticles for EUV lithography without the use of a patterned absorber

    DOEpatents

    Stearns, Daniel G [Los Altos, CA; Sweeney, Donald W [San Ramon, CA; Mirkarimi, Paul B [Sunol, CA

    2003-10-21

    Absorber material used in conventional EUVL reticles is eliminated by introducing a direct modulation in the complex-valued reflectance of the multilayer. A spatially localized energy source such as a focused electron or ion beam directly writes a reticle pattern onto the reflective multilayer coating. Interdiffusion is activated within the film by an energy source that causes the multilayer period to contract in the exposed regions. The contraction is accurately determined by the energy dose. A controllable variation in the phase and amplitude of the reflected field in the reticle plane is produced by the spatial modulation of the multilayer period. This method for patterning an EUVL reticle has the advantages of (1) avoiding the process steps associated with depositing and patterning an absorber layer and (2) providing control of the phase and amplitude of the reflected field with high spatial resolution.

  1. Direct Writing of Graphene-based Nanoelectronics via Atomic Force Microscopy

    DTIC Science & Technology

    2012-05-07

    To) 07-05-2012 4. TITLE AND SUBTITLE 5a. CONTRACT NUMBER Direct Writing of Graphene -based Nanoelectronics via Atomic Force Microscopy 5b. GRANT...ABSTRACT This project employs direct writing with an atomic force microscope (AFM) to fabricate simple graphene -based electronic components like resistors...and transistors at nanometer-length scales. The goal is to explore their electrical properties for graphene -based electronics. Conducting

  2. Dynamic modulation of electronic properties of graphene by localized carbon doping using focused electron beam induced deposition

    NASA Astrophysics Data System (ADS)

    Kim, S.; Russell, M.; Henry, M.; Kim, S. S.; Naik, R. R.; Voevodin, A. A.; Jang, S. S.; Tsukruk, V. V.; Fedorov, A. G.

    2015-09-01

    We report on the first demonstration of controllable carbon doping of graphene to engineer local electronic properties of a graphene conduction channel using focused electron beam induced deposition (FEBID). Electrical measurements indicate that an ``n-p-n'' junction on graphene conduction channel is formed by partial carbon deposition near the source and drain metal contacts by low energy (<50 eV) secondary electrons due to inelastic collisions of long range backscattered primary electrons generated from a low dose of high energy (25 keV) electron beam (1 × 1018 e- per cm2). Detailed AFM imaging provides direct evidence of the new mechanism responsible for dynamic evolution of the locally varying graphene doping. The FEBID carbon atoms, which are physisorbed and weakly bound to graphene, diffuse towards the middle of graphene conduction channel due to their surface chemical potential gradient, resulting in negative shift of Dirac voltage. Increasing a primary electron dose to 1 × 1019 e- per cm2 results in a significant increase of carbon deposition, such that it covers the entire graphene conduction channel at high surface density, leading to n-doping of graphene channel. Collectively, these findings establish a unique capability of FEBID technique to dynamically modulate the doping state of graphene, thus enabling a new route to resist-free, ``direct-write'' functional patterning of graphene-based electronic devices with potential for on-demand re-configurability.We report on the first demonstration of controllable carbon doping of graphene to engineer local electronic properties of a graphene conduction channel using focused electron beam induced deposition (FEBID). Electrical measurements indicate that an ``n-p-n'' junction on graphene conduction channel is formed by partial carbon deposition near the source and drain metal contacts by low energy (<50 eV) secondary electrons due to inelastic collisions of long range backscattered primary electrons generated from a low dose of high energy (25 keV) electron beam (1 × 1018 e- per cm2). Detailed AFM imaging provides direct evidence of the new mechanism responsible for dynamic evolution of the locally varying graphene doping. The FEBID carbon atoms, which are physisorbed and weakly bound to graphene, diffuse towards the middle of graphene conduction channel due to their surface chemical potential gradient, resulting in negative shift of Dirac voltage. Increasing a primary electron dose to 1 × 1019 e- per cm2 results in a significant increase of carbon deposition, such that it covers the entire graphene conduction channel at high surface density, leading to n-doping of graphene channel. Collectively, these findings establish a unique capability of FEBID technique to dynamically modulate the doping state of graphene, thus enabling a new route to resist-free, ``direct-write'' functional patterning of graphene-based electronic devices with potential for on-demand re-configurability. Electronic supplementary information (ESI) available: Optimization of a PMMA-mediated wet transfer method of graphene, transfer characteristics of all the channels, raw data of drain-source current measured by sweeping a backgate voltage and an AFM topography image and cross-sectional profiles of Fig. 4 and the corresponding electrical measurement along with an estimation of carbon diffusion coefficient. See DOI: 10.1039/c5nr04063a

  3. Potential of e-beam writing for diffractive optics

    NASA Astrophysics Data System (ADS)

    Kley, Ernst-Bernhard; Wyrowski, Frank

    1997-05-01

    E-beam lithography (EBL) is a powerful tool in optics. Optician can use the progress in EBL to fabricate optical components and systems with novel functions. However, EBL is dominated by microelectronics. Therefore the demands of optics are not always met by the exiting EBL technology. Some possibilities as well as limits of EBL in optics are discussed at the example of diffractive optics.

  4. Virtual reality using guided imagery to create Kanji or Hiragana by computer graphics: I

    NASA Astrophysics Data System (ADS)

    Ishigame, Masaaki; Miura, Nozomu; Hosaka, Akiko

    1997-04-01

    We have been studying a kind of word-processor that is able to create Japanese characters, Kanji or Hiragana strings in the cursive style, using an electronic writing brush model. Int his paper, we describe in detail the operation characteristics of the electronic writing brush which we have proposed. We defined a touch shape pattern of the electronic writing brush as a form which is projected as a circle and a cone. The brush goes on certain points of the skeleton of the character figure which is given as skeleton data. The thickness of the line is determined by a diametric variable brush pressure. Our progressive action model can rotate the direction of the writing brush tip corresponding to the difference angle between the direction of brush tip and the direction of the brush movement, and also the softness of the writing brush to express the writing brush method called the side writing brush. The front side and back side of the writing brush can be expressed in a calligraphic drawing. With our technique we can draw characters in actual stroke order on a virtual computer plane as if they are written by an actual writing brush.

  5. Flexible foils formed by a prolonged electron beam irradiation in scanning electron microscope

    NASA Astrophysics Data System (ADS)

    Čechal, Jan; Šikola, Tomáš

    2017-11-01

    The ubiquitous presence of hydrocarbon contamination on solid surfaces alters their inherent physical properties and complicates the surface analyses. An irradiation of sample surface with electron beam can lead to the chemical transformation of the hydrocarbon layer to carbon films, which are flexible and capable of acting as a barrier for chemical etching of an underlying material. The growth of these foils is limited by supply of hydrocarbons to the writing beam position rather than the electron dose or electron beam current. The prepared films can find their applications in fabrication of surface nanostructures without a need of an electron sensitive resist material.

  6. 48 CFR 2052.215-71 - Project officer authority.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... directive whatever. (d) All technical directions must be issued in writing by the project officer or must be... advise the contractor in writing that, in the contracting officer's opinion, the technical direction is... subject to the technical direction of the NRC project officer. The term technical direction is defined to...

  7. Positional Accuracy in Optical Trap-Assisted Nanolithography

    NASA Astrophysics Data System (ADS)

    Arnold, Craig B.; McLeod, Euan

    2009-03-01

    The ability to directly print patterns on size scales below 100 nm is important for many applications where the production or repair of high resolution and density features are important. Laser-based direct-write methods have the benefit of quickly and easily being able to modify and create structures on existing devices, but feature sizes are conventionally limited by diffraction. In this presentation, we show how to overcome this limit with a new method of probe-based near-field nanopatterning in which we employ a CW laser to optically trap and manipulate dispersed microspheres against a substrate using a 2-d Bessel beam optical trap. A secondary, pulsed nanosecond laser at 355 nm is directed through the bead and used to modify the surface below the microsphere, taking advantage of the near-field enhancement in order to produce materials modification with feature sizes under 100 nm. Here, we analyze the 3-d positioning accuracy of the microsphere through analytic modeling as a function of experimental parameters. The model is verified in all directions for our experimental conditions and is used to predict the conditions required for improved positional accuracy.

  8. Writing Instruction.

    ERIC Educational Resources Information Center

    Richgels, Donald J.

    2003-01-01

    Discusses four recent writing books: "Teaching to Write: Theory Into Practice" (Jane B. Hughey and Charlotte Slack); "The Writing Teacher's Handbook" (Jo Phenix); "Scaffolding Young Writers: A Writers' Workshop Approach" (Linda J. Dorn and Carla Soffos); and "Directing the Writing Workshop: An Elementary Teacher's Handbook" (Jean Wallace Gillet…

  9. Using Literature-Based Prompts To Teach Writing Competencies: Directed Reading and Writing Lessons.

    ERIC Educational Resources Information Center

    Gelsinger, Barry D.

    Intended to help teachers integrate writing instruction with the study of literature, this teaching guide offers a philosophy of writing instruction, describes a procedure for teaching reading and writing lessons, and provides a sequence of writing skills. For various literature selections, the guide defines vocabulary, provides topic discussion…

  10. Two-photon reduction: a cost-effective method for fabrication of functional metallic nanostructures

    NASA Astrophysics Data System (ADS)

    Tabrizi, Sahar; Cao, YaoYu; Lin, Han; Jia, BaoHua

    2017-03-01

    Metallic nanostructures have underpinned plasmonic-based advanced photonic devices in a broad range of research fields over the last decade including physics, engineering, material science and bioscience. The key to realizing functional plasmonic resonances that can manipulate light at the optical frequencies relies on the creation of conductive metallic structures at the nanoscale with low structural defects. Currently, most plasmonic nanostructures are fabricated either by electron beam lithography (EBL) or by focused ion beam (FIB) milling, which are expensive, complicated and time-consuming. In comparison, the direct laser writing (DLW) technique has demonstrated its high spatial resolution and cost-effectiveness in three-dimensional fabrication of micro/nanostructures. Furthermore, the recent breakthroughs in superresolution nanofabrication and parallel writing have significantly advanced the fabrication resolution and throughput of the DLW method and made it one of the promising future nanofabrication technologies with low-cost and scalability. In this review, we provide a comprehensive summary of the state-of-the-art DLW fabrication technology for nanometer scale metallic structures. The fabrication mechanisms, different material choices, fabrication capability, including resolution, conductivity and structure surface smoothness, as well as the characterization methods and achievable devices for different applications are presented. In particular, the development trends of the field and the perspectives for future opportunities and challenges are provided at the end of the review. It has been demonstrated that the quality of the metallic structures fabricated using the DLW method is excellent compared with other methods providing a new and enabling platform for functional nanophotonic device fabrication.

  11. Holographic analysis of photopolymers

    NASA Astrophysics Data System (ADS)

    Sullivan, Amy C.; Alim, Marvin D.; Glugla, David J.; McLeod, Robert R.

    2017-05-01

    Two-beam holographic exposure and subsequent monitoring of the time-dependent first-order Bragg diffraction is a common method for investigating the refractive index response of holographic photopolymers for a range of input writing conditions. The experimental set up is straightforward, and Kogelnik's well-known coupled wave theory (CWT)[1] can be used to separate measurements of the change in index of refraction (Δn) and the thickness of transmission and reflection holograms. However, CWT assumes that the hologram is written and read out with a plane wave and that the hologram is uniform in both the transverse and depth dimensions, assumptions that are rarely valid in practical holographic testing. The effect of deviations from these assumptions on the measured thickness and Δn become more pronounced for over-modulated exposures. As commercial and research polymers reach refractive index modulations on the order of 10-2, even relatively thin (< 20 μm thick) transmission volume holograms become overmodulated. Peak Δn measurements for material analysis must be carefully evaluated in this regime. We present a study of the effects of the finite Gaussian write and read beams on the CWT analysis of photopolymer materials and discuss what intuition this can give us about the effect other non-uniformities, such as mechanical stresses and significant absorption of the write beam, will have on the analysis of the maximum attainable refractive index in a material system. We use this analysis to study a model high Δn two-stage photopolymer holographic material using both transmission and reflection holograms.

  12. Direct-laser metal writing of surface acoustic wave transducers for integrated-optic spatial light modulators in lithium niobate

    NASA Astrophysics Data System (ADS)

    Datta, Bianca C.; Savidis, Nickolaos; Moebius, Michael; Jolly, Sundeep; Mazur, Eric; Bove, V. Michael

    2017-02-01

    Recently, the fabrication of high-resolution silver nanostructures using a femtosecond laser-based direct write process in a gelatin matrix was reported. The application of direct metal writing towards feature development has also been explored with direct metal fusion, in which metal is fused onto the surface of the substrate via a femtosecond laser process. In this paper, we present a comparative study of gelatin matrix and metal fusion approaches for directly laser-written fabrication of surface acoustic wave transducers on a lithium niobate substrate for application in integrated optic spatial light modulators.

  13. Microfabrication of biocompatible hydrogels by proton beam writing

    NASA Astrophysics Data System (ADS)

    Nagasawa, Naotsugu; Kimura, Atsushi; Idesaki, Akira; Yamada, Naoto; Koka, Masashi; Satoh, Takahiro; Ishii, Yasuyuki; Taguchi, Mitsumasa

    2017-10-01

    Functionalization of biocompatible materials is expected to be widely applied in biomedical engineering and regenerative medicine fields. Hydrogel has been expected as a biocompatible scaffold which support to keep an organ shape during cell multiplying in regenerative medicine. Therefore, it is important to understanding a surface microstructure (minute shape, depth of flute) and a chemical characteristic of the hydrogel affecting the cell culture. Here, we investigate the microfabrication of biocompatible polymeric materials, such as the water-soluble polysaccharide derivatives hydroxypropyl cellulose and carboxymethyl cellulose, by use of proton beam writing (PBW). These polymeric materials were dissolved thoroughly in pure water using a planetary centrifugal mixer, and a sample sheet (1 mm thick) was formed on polyethylene terephthalate (PET) film. Crosslinking to form hydrogels was induced using a 3.0 MeV focused proton beam from the single-ended accelerator at Takasaki Ion Accelerators for Advanced Radiation Application. The aqueous samples were horizontally irradiated with the proton beam through the PET cover film, and then rinsed with deionized water. Microstructured hydrogels were obtained on the PET film using the PBW technique without toxic crosslinking reagents. Cell adhesion and proliferation on the microfabricated biocompatible hydrogels were investigated. Microfabrication of HPC and CMC by the use of PBW is expected to produce new biocompatible materials that can be applied in biological and medical applications.

  14. CA resist with high sensitivity and sub-100-nm resolution for advanced mask and device making

    NASA Astrophysics Data System (ADS)

    Kwong, Ranee W.; Huang, Wu-Song; Hartley, John G.; Moreau, Wayne M.; Robinson, Christopher F.; Angelopoulos, Marie; Magg, Christopher; Lawliss, Mark

    2000-07-01

    Recently, there is significant interest in using CA resists for electron beam (E-Beam) applications including mask making, direct write, and projection printing. CA resists provide superior lithographic performance in comparison to traditional non CA E-beam resists in particular high contrast, resolution, and sensitivity. However, most of the commercially available CA resists have the concern of airborne base contaminants and sensitivity to PAB and/or PEB temperatures. In this presentation, we will discuss a new improved ketal resist system referred to as KRS-XE which exhibits excellent lithography, is robust toward airborne base, compatible with 0.263 N TMAH aqueous developer and exhibits a large PAB/PEB latitude. With the combination of a high performance mask making E-beam exposure tool, high kV (75 kV) shaped beam system EL4+ and the KRS-XE resist, we have printed 75 nm lines/space features with excellent profile control at a dose of 13 (mu) C/cm2 at 75 kV. The shaped beam vector scan system used here provides an unique property in resolving small features in lithography and throughput. Overhead in EL4+ limits the systems ability to fully exploit the sensitivity of the new resist for throughput. The EL5 system, currently in the build phase, has sufficiently low overhead that it is projected to print a 4X, 16G, DRAM mask with OPC in under 3 hours with the CA resist. We will discuss the throughput advantages of the next generation EL5 system over the existing EL4+. In addition we will show the resolution of KRS-XE down to 70 nm using the PREVAIL projection printing system.

  15. Direct writing of birefringent elements by ultrafast laser nanostructuring in multicomponent glass

    NASA Astrophysics Data System (ADS)

    Fedotov, S. S.; Drevinskas, R.; Lotarev, S. V.; Lipatiev, A. S.; Beresna, M.; ČerkauskaitÄ--, A.; Sigaev, V. N.; Kazansky, P. G.

    2016-02-01

    Self-assembled nanostructures created by femtosecond laser irradiation are demonstrated in alkali-free aluminoborosilicate glass. The growth of the induced retardance associated with the nanograting formation is three orders of magnitude slower than in silica glass and is observed only within a narrow range of pulse energies. However, the strength of retardance asymptotically approaches the value typically measured in pure silica glass, which is attractive for practical applications. A similar intensity threshold for nanograting formation of about 1 TW/cm2 is observed for all glasses studied. The radially polarized vortex beam micro-converter designed as a space-variant quarter-wave retarder for the near-infrared spectral range is imprinted in commercial Schott AF32 glass.

  16. Fabrication de structures tridimensionnelles de nanocomposites polymeres charges de nanotubes de carbone a simple paroi

    NASA Astrophysics Data System (ADS)

    Laberge Lebel, Louis

    There is currently a worldwide effort for advances in micro and nanotechnologies due to their high potential for technological applications in fields such as microelectromechanical systems (MEMS), organic electronics and structural microstructures for aerospace. In these applications, carbon nanotube/polymer nanocomposites represent interesting material options compared to conventional resins for their enhanced mechanical and electrical properties. However, several significant scientific and technological challenges must first be overcome in order to rapidly and cost-effectively fabricate nanocomposite-based microdevices. Fabrication techniques have emerged for fabricating one- of two-dimensional (1D/2D) nanocomposite structures but few techniques are available for three-dimensional (3D) nanocomposite structures. The overall objective of this thesis is the development of a manufacturing technique allowing the fabrication of 3D structures of single-walled carbon nanotube (C-SWNT)/polymer nanocomposite. This thesis reports the development of a direct-write fabrication technique that greatly extends the fabrication space for 3D carbon nanotube/polymer nanocomposite structures. The UV-assisted direct-write (UV-DW) technique employs the robotically-controlled micro-extrusion of a nanocomposite filament combined with a UV exposure that follows the extrusion point. Upon curing, the increased rigidity of the extruded filament enables the creation of multi-directional shapes along the trajectory of the extrusion point. The C-SWNT material is produced by laser ablation of a graphite target and purified using a nitric acid reflux. The as-grown and purified material is characterized under transmission electron microscopy and Raman spectroscopy. The purification procedure successfully graphed carboxylic groups on the surface of the C-SWNTs, shown by X-ray photoelectron spectroscopies. An incorporation procedure in the polymer is developed involving a non-covalent functionalization of the nanotubes by zinc protoporphyrin IX molecule and high shear mixing using a three-roll mill. The incorporation of the C-SWNTs into the resin led to an increase of the viscosity and the apparition of a shear thinning behaviour, characterized by capillary viscometry. The nanocomposite UV-curing behavior is characterized under differential scanning calorimetry coupled with a UV source. A further adjustment of the shear thinning behavior using fumed silica enabled the UV-DW fabrication of microbeams. Mechanical characterization reveals significant increase in both strength (by ˜64%) and modulus (by more than 15 times). These mechanical enhancements are attributed to both the covalent and the non-covalent functionalizations of the C-SWNTs. Nanocomposite spring networks composed of three micro-coils fabricated using the UV-DW technique are mechanically tested under compression and show a rigidity of ˜11.5 mN/mm. A micro-coil is also deposited between two uneven electrodes and a 10-6 S/cm electrical conductivity is measured. Nanocomposite scaffold structures are also deposited using the UV-DW technique. This thesis also reports the fabrication of 3D micro structured beams reinforced with the C-SWNT/polymer nanocomposite by using an approach based on the infiltration of 3D microfluidic networks. The 3D microfluidic network is first fabricated by the direct-write assembly method, which consists of the robotized deposition of fugitive ink filaments on an epoxy substrate, forming a 3D micro structured scaffold. After encapsulating the 3D micro-scaffold structure with an epoxy resin, the fugitive ink is liquefied and removed, resulting in a 3D network of interconnected microchannels. This microfluidic network is then infiltrated by the C-SWNT/polyurethane nanocomposite and subsequently cured. The final samples consist of rectangular beams having a complex 3D-skeleton structure of C-SWNT/polyrner nanocomposite fibers, adapted to offer better performance under flexural solicitation. Dynamic mechanical analysis in flexion show an increase of 12.5% in the storage modulus under 35°C compared to the resin infiltrated beams. The manufacturing techniques demonstrated here, i.e. UV assisted direct writing and the infiltration of 3D microfluidic networks, open new prospects for the achievement of 3D reinforced micro structures that could find application in organic electronics, MEMS, sensor, tissue engineering scaffolds and aerospace.

  17. Looking into the crystal ball: future device learning using hybrid e-beam and optical lithography (Keynote Paper)

    NASA Astrophysics Data System (ADS)

    Steen, S. E.; McNab, S. J.; Sekaric, L.; Babich, I.; Patel, J.; Bucchignano, J.; Rooks, M.; Fried, D. M.; Topol, A. W.; Brancaccio, J. R.; Yu, R.; Hergenrother, J. M.; Doyle, J. P.; Nunes, R.; Viswanathan, R. G.; Purushothaman, S.; Rothwell, M. B.

    2005-05-01

    Semiconductor process development teams are faced with increasing process and integration complexity while the time between lithographic capability and volume production has remained more or less constant over the last decade. Lithography tools have often gated the volume checkpoint of a new device node on the ITRS roadmap. The processes have to be redeveloped after the tooling capability for the new groundrule is obtained since straight scaling is no longer sufficient. In certain cases the time window that the process development teams have is actually decreasing. In the extreme, some forecasts are showing that by the time the 45nm technology node is scheduled for volume production, the tooling vendors will just begin shipping the tools required for this technology node. To address this time pressure, IBM has implemented a hybrid-lithography strategy that marries the advantages of optical lithography (high throughput) with electron beam direct write lithography (high resolution and alignment capability). This hybrid-lithography scheme allows for the timely development of semiconductor processes for the 32nm node, and beyond. In this paper we will describe how hybrid lithography has enabled early process integration and device learning and how IBM applied e-beam & optical hybrid lithography to create the world's smallest working SRAM cell.

  18. 48 CFR 1552.237-71 - Technical direction.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    .... (d) Technical direction will be issued in writing or confirmed in writing within five (5) days after... 48 Federal Acquisition Regulations System 6 2010-10-01 2010-10-01 true Technical direction. 1552... Technical direction. As prescribed in 1537.110, insert a clause substantially the same as the following...

  19. Optically erasable and rewritable solid-state holograms.

    NASA Technical Reports Server (NTRS)

    Gaylord, T. K.; Rabson, T. A.; Tittel, F. K.

    1972-01-01

    Optical holographic storage in single-crystal LiNbO3 is described which can be optically erased at room temperature and then rewritten with no degradation in efficiency or writing rate. The diffraction efficiencies associated with the process are about 0.0001. Some variations from previously obtained results include a lack of threshold power density for writing, very-long-term persistence of the stored hologram, and a lack of a dependence of the diffracted intensity on the polarization of the readout beam.

  20. Effect of Direct Grammar Instruction on Student Writing Skills

    ERIC Educational Resources Information Center

    Robinson, Lisa; Feng, Jay

    2016-01-01

    Grammar Instruction has an important role to play in helping students to speak and write more effectively. The purpose of this study was to examine the effects of direct grammar instruction on the quality of student's writing skills. The participants in this study included 18 fifth grade students and two fifth grade teachers. Based on the results…

  1. The Development of Composition Skills via Directed Writing.

    ERIC Educational Resources Information Center

    Rahilly, Leonard J.

    To alleviate problems associated with free composition as a method of foreign language writing instruction, the directed writing method was adapted for use in a college French composition course. High-quality French texts, often of only a page or two and written by native speakers, are used as a basis for grammatical analysis and discussion and a…

  2. Second Language Learners' Performance and Strategies When Writing Direct and Translated Essays

    ERIC Educational Resources Information Center

    Ismail, Sadiq Abdulwahed Ahmed; Alsheikh, Negmeldin Omer

    2012-01-01

    The purpose of this study was to investigate ESL students' performance and strategies when writing direct and translated essays. The study also aimed at exploring students' strategies when writing in L2 (English) and L1 (Arabic). The study used a mixture of quantitative and qualitative procedures for data collection and analysis. Adapted strategy…

  3. Fabrication of high-transmission microporous membranes by proton beam writing-based molding technique

    NASA Astrophysics Data System (ADS)

    Wang, Liping; Meyer, Clemens; Guibert, Edouard; Homsy, Alexandra; Whitlow, Harry J.

    2017-08-01

    Porous membranes are widely used as filters in a broad range of micro and nanofluidic applications, e.g. organelle sorters, permeable cell growth substrates, and plasma filtration. Conventional silicon fabrication approaches are not suitable for microporous membranes due to the low mechanical stability of thin film substrates. Other techniques like ion track etching are limited to the production of randomly distributed and randomly orientated pores with non-uniform pore sizes. In this project, we developed a procedure for fabricating high-transmission microporous membranes by proton beam writing (PBW) with a combination of spin-casting and soft lithography. In this approach, focused 2 MeV protons were used to lithographically write patterns consisting of hexagonal arrays of high-density pillars of few μm size in a SU-8 layer coated on a silicon wafer. After development, the pillars were conformably coated with a thin film of poly-para-xylylene (Parylene)-C release agent and spin-coated with polydimethylsiloxane (PDMS). To facilitate demolding, a special technique based on the use of a laser-cut sealing tape ring was developed. This method facilitated the successful delamination of 20-μm thick PDMS membrane with high-density micropores from the mold without rupture or damage.

  4. The technical consideration of multi-beam mask writer for production

    NASA Astrophysics Data System (ADS)

    Lee, Sang Hee; Ahn, Byung-Sup; Choi, Jin; Shin, In Kyun; Tamamushi, Shuichi; Jeon, Chan-Uk

    2016-10-01

    Multi-beam mask writer is under development to solve the throughput and patterning resolution problems in VSB mask writer. Theoretically, the writing time is appropriate for future design node and the resolution is improved with multi-beam mask writer. Many previous studies show the feasible results of resolution, CD control and registration. Although such technical results of development tool seem to be enough for mass production, there are still many unexpected problems for real mass production. In this report, the technical challenges of multi-beam mask writer are discussed in terms of production and application. The problems and issues are defined based on the performance of current development tool compared with the requirements of mask quality. Using the simulation and experiment, we analyze the specific characteristics of electron beam in multi-beam mask writer scheme. Consequently, we suggest necessary specifications for mass production with multi-beam mask writer in the future.

  5. Future direction of direct writing

    NASA Astrophysics Data System (ADS)

    Kim, Nam-Soo; Han, Kenneth N.

    2010-11-01

    Direct write technology using special inks consisting of finely dispersed metal nanoparticles in liquid is receiving an undivided attention in recent years for its wide range of applicability in modern electronic industry. The application of this technology covers radio frequency identification-tag (RFID-tag), flexible-electronics, organic light emitting diodes (OLED) display, e-paper, antenna, bumpers used in flip-chip, underfilling, frit, miniresistance applications and biological uses, artificial dental applications and many more. In this paper, the authors have reviewed various direct write technologies on the market and discussed their advantages and shortfalls. Emphasis has given on microdispensing deposition write (MDDW), maskless mesoscale materials deposition (M3D), and ink-jet technologies. All of these technologies allow printing various patterns without employing a mask or a resist with an enhanced speed with the aid of computer. MDDW and M3D are capable of drawing patterns in three-dimension and MDDW, in particular, is capable of writing nanoinks with high viscosity. However, it is still far away for direct write to be fully implemented in the commercial arena. One of the hurdles to overcome is in manufacturing conductive inks which are chemically and physically stable, capable of drawing patterns with acceptable conductivity, and also capable of drawing patterns with acceptable adhesiveness with the substrates. The authors have briefly discussed problems involved in manufacturing nanometal inks to be used in various writing devices. There are numerous factors to be considered in manufacturing such inks. They are reducing agents, concentrations, oxidation, compact ability allowing good conductivity, and stability in suspension.

  6. Suspended tungsten-based nanowires with enhanced mechanical properties grown by focused ion beam induced deposition

    NASA Astrophysics Data System (ADS)

    Córdoba, Rosa; Lorenzoni, Matteo; Pablo-Navarro, Javier; Magén, César; Pérez-Murano, Francesc; María De Teresa, José

    2017-11-01

    The implementation of three-dimensional (3D) nano-objects as building blocks for the next generation of electro-mechanical, memory and sensing nano-devices is at the forefront of technology. The direct writing of functional 3D nanostructures is made feasible by using a method based on focused ion beam induced deposition (FIBID). We use this technique to grow horizontally suspended tungsten nanowires and then study their nano-mechanical properties by three-point bending method with atomic force microscopy. These measurements reveal that these nanowires exhibit a yield strength up to 12 times higher than that of the bulk tungsten, and near the theoretical value of 0.1 times the Young’s modulus (E). We find a size dependence of E that is adequately described by a core-shell model, which has been confirmed by transmission electron microscopy and compositional analysis at the nanoscale. Additionally, we show that experimental resonance frequencies of suspended nanowires (in the MHz range) are in good agreement with theoretical values. These extraordinary mechanical properties are key to designing electro-mechanically robust nanodevices based on FIBID tungsten nanowires.

  7. Real-Time Fourier Transformed Holographic Associative Memory With Photorefractive Material

    NASA Astrophysics Data System (ADS)

    Changsuk, Oh; Hankyu, Park

    1989-02-01

    We describe a volume holographic associative memory using photorefractive material and conventional planar mirror. Multiple hologram is generated with two angular multiplexed writing beams and Fourier transformed object beam in BaTiO3 crystal at 0.6328 μm. Complete image can be recalled successfully by partial input of original stored image. It is proved that our system is useful for optical implementation of real-time associative memory and location addressable memory.

  8. Assessing the Writing of Deaf College Students: Reevaluating a Direct Assessment of Writing

    ERIC Educational Resources Information Center

    Schley, Sara; Albertini, John

    2005-01-01

    The NTID Writing Test was developed to assess the writing ability of postsecondary deaf students entering the National Technical Institute for the Deaf and to determine their appropriate placement into developmental writing courses. While previous research (Albertini et al., 1986; Albertini et al., 1996; Bochner, Albertini, Samar, & Metz, 1992)…

  9. Effects of Directed Written Disclosure on Grief and Distress Symptoms among Bereaved Individuals

    ERIC Educational Resources Information Center

    Lichtenthal, Wendy G.; Cruess, Dean G.

    2010-01-01

    Bereavement-specific written disclosure trials have generally demonstrated null effects, but these studies have not directed the focus of writing. This randomized controlled trial compared directed writing that focused on either sense-making or benefit-finding, both associated with adjustment to loss, to traditional, non-directed emotional…

  10. The Impact of Western Criticisms of Japanese Rhetorical Approaches on Learners of Japanese

    ERIC Educational Resources Information Center

    McKinley, Jim

    2014-01-01

    For learners of Japanese, a conundrum arises at university level as they are expected to be able to shift between direct and indirect language in various writing tasks. The apparent indirectness in inductive language is required of regular writing tasks such as response essays and e-mails, while the directness of deductive academic writing, a…

  11. Effects of Direct Instruction and Strategy Modeling on Upper-Primary Students’ Writing Development

    PubMed Central

    López, Paula; Torrance, Mark; Rijlaarsdam, Gert; Fidalgo, Raquel

    2017-01-01

    Strategy-focused instruction is one of the most effective approaches to improve writing skills. It aims to teach developing writers strategies that give them executive control over their writing processes. Programs under this kind of instruction tend to have multiple components that include direct instruction, modeling and scaffolded practice. This multi-component nature has two drawbacks: it makes implementation challenging due to the amount of time and training required to perform each stage, and it is difficult to determine the underlying mechanisms that contribute to its effectiveness. To unpack why strategy-focused instruction is effective, we explored the specific effects of two key components: direct teaching of writing strategies and modeling of strategy use. Six classes (133 students) of upper-primary education were randomly assigned to one of the two experimental conditions, in which students received instruction aimed at developing effective strategies for planning and drafting, or control group with no strategy instruction: Direct Instruction (N = 46), Modeling (N = 45), and Control (N = 42). Writing performance was assessed before the intervention and immediately after the intervention with two tasks, one collaborative and the other one individual to explore whether differential effects resulted from students writing alone or in pairs. Writing performance was assessed through reader-based and text-based measures of text quality. Results at post-test showed similar improvement in both intervention conditions, relatively to controls, in all measures and in both the collaborative and the individual task. No statistically significant differences were observed between experimental conditions. These findings suggest that both components, direct teaching and modeling, are equally effective in improving writing skills in upper primary students, and these effects are present even after a short training. PMID:28713299

  12. Tubular filamentation for laser material processing

    PubMed Central

    Xie, Chen; Jukna, Vytautas; Milián, Carles; Giust, Remo; Ouadghiri-Idrissi, Ismail; Itina, Tatiana; Dudley, John M.; Couairon, Arnaud; Courvoisier, Francois

    2015-01-01

    An open challenge in the important field of femtosecond laser material processing is the controlled internal structuring of dielectric materials. Although the availability of high energy high repetition rate femtosecond lasers has led to many advances in this field, writing structures within transparent dielectrics at intensities exceeding 1013 W/cm2 has remained difficult as it is associated with significant nonlinear spatial distortion. This letter reports the existence of a new propagation regime for femtosecond pulses at high power that overcomes this challenge, associated with the generation of a hollow uniform and intense light tube that remains propagation invariant even at intensities associated with dense plasma formation. This regime is seeded from higher order nondiffracting Bessel beams, which carry an optical vortex charge. Numerical simulations are quantitatively confirmed by experiments where a novel experimental approach allows direct imaging of the 3D fluence distribution within transparent solids. We also analyze the transitions to other propagation regimes in near and far fields. We demonstrate how the generation of plasma in this tubular geometry can lead to applications in ultrafast laser material processing in terms of single shot index writing, and discuss how it opens important perspectives for material compression and filamentation guiding in atmosphere. PMID:25753215

  13. Cladding-like waveguide fabricated by cooperation of ultrafast laser writing and ion irradiation: characterization and laser generation.

    PubMed

    Lv, Jinman; Shang, Zhen; Tan, Yang; Vázquez de Aldana, Javier Rodríguez; Chen, Feng

    2017-08-07

    We report the surface cladding-like waveguide fabricated by the cooperation of the ultrafast laser writing and the ion irradiation. The ultrafast laser writes tracks near the surface of the Nd:YAG crystal, constructing a semi-circle columnar structure with a decreased refractive index of - 0.00208. Then, the Nd:YAG crystal is irradiated by the Carbon ion beam, forming an enhanced-well in the semi-circle columnar with an increased refractive index of + 0.0024. Tracks and the enhanced-well consisted a surface cladding-like waveguide. Utilizing this cladding-like waveguide as the gain medium for the waveguide lasing, optimized characterizations were observed compared with the monolayer waveguide. This work demonstrates the refractive index of the Nd:YAG crystal can be well tailored by the cooperation of the ultrafast laser writing and the ion irradiation, which provides an convenient way to fabricate the complex and multilayered photonics devices.

  14. Electron Beam/Optical Hybrid Lithography For The Production Of Gallium Arsenide Monolithic Microwave Integrated Circuits (Mimics)

    NASA Astrophysics Data System (ADS)

    Nagarajan, Rao M.; Rask, Steven D.

    1988-06-01

    A hybrid lithography technique is described in which selected levels are fabricated by high resolution direct write electron beam lithography and all other levels are fabricated optically. This technique permits subhalf micron geometries and the site-by-site alignment for each field written by electron beam lithography while still maintaining the high throughput possible with optical lithography. The goal is to improve throughput and reduce overall cost of fabricating MIMIC GaAS chips without compromising device performance. The lithography equipment used for these experiments is the Cambridge Electron beam vector scan system EBMF 6.4 capable of achieving ultra high current densities with a beam of circular cross section and a gaussian intensity profile operated at 20 kev. The optical aligner is a Karl Suss Contact aligner. The flexibility of the Cambridge electron beam system is matched to the less flexible Karl Suss contact aligner. The lithography related factors, such as image placement, exposure and process related analyses, which influence overlay, pattern quality and performance, are discussed. A process chip containing 3.2768mm fields in an eleven by eleven array was used for alignment evaluation on a 3" semi-insulating GaAS wafer. Each test chip contained five optical verniers and four Prometrix registration marks per field along with metal bumps for alignment marks. The process parameters for these chips are identical to those of HEMT/epi-MESFET ohmic contact and gate layer processes. These layers were used to evaluate the overlay accuracy because of their critical alignment and dimensional control requirements. Two cases were examined: (1) Electron beam written gate layers aligned to optically imaged ohmic contact layers and (2) Electron beam written gate layers aligned to electron beam written ohmic contact layers. The effect of substrate charging by the electron beam is also investigated. The resulting peak overlay error accuracies are: (1) Electron beam to optical with t 0.2μm (2 sigma) and (2) Electron beam to electron beam with f 0.lμm (2 sigma). These results suggest that the electron beam/optical hybrid lithography techniques could be used for MIMIC volume production as alignment tolerances required by GaAS chips are met in both cases. These results are discussed in detail.

  15. Assessing the writing of deaf college students: reevaluating a direct assessment of writing.

    PubMed

    Schley, Sara; Albertini, John

    2005-01-01

    The NTID Writing Test was developed to assess the writing ability of postsecondary deaf students entering the National Technical Institute for the Deaf and to determine their appropriate placement into developmental writing courses. While previous research (Albertini et al., 1986; Albertini et al., 1996; Bochner, Albertini, Samar, & Metz, 1992) has shown the test to be reliable between multiple test raters and as a valid measure of writing ability for placement into these courses, changes in curriculum and the rater pool necessitated a new look at interrater reliability and concurrent validity. We evaluated the rating scores for 236 samples from students who entered the college during the fall 2001. Using a multiprong approach, we confirmed the interrater reliability and the validity of this direct measure of assessment. The implications of continued use of this and similar tests in light of definitions of validity, local control, and the nature of writing are discussed.

  16. Character Reversal in Children: The Prominent Role of Writing Direction

    ERIC Educational Resources Information Center

    Fischer, Jean-Paul

    2017-01-01

    Recent research has established that 5- to 6-year-old typically developing children in a left-right writing culture spontaneously reverse left-oriented characters (e.g., they write a [reversed J] instead of J) when they write single characters. Thus, children seem to implicitly apply a right-writing rule (RWR: see Fischer & Koch, 2016a). In…

  17. Three-dimensional optical memory systems based on photochromic materials: polarization control of two-color data writing and the possibility of nondestructive data reading

    NASA Astrophysics Data System (ADS)

    Akimov, D. A.; Fedotov, Andrei B.; Koroteev, Nikolai I.; Magnitskii, S. A.; Naumov, A. N.; Sidorov-Biryukov, Dmitri A.; Sokoluk, N. T.; Zheltikov, Alexei M.

    1998-04-01

    The possibilities of optimizing data writing and reading in devices of 3D optical memory using photochromic materials are discussed. We quantitatively analyze linear and nonlinear optical properties of induline spiropyran molecules, which allows us to estimate the efficiency of using such materials for implementing 3D optical-memory devices. It is demonstrated that, with an appropriate choice of polarization vectors of laser beams, one can considerably improve the efficiency of two-photon writing in photochromic materials. The problem of reading the data stored in a photochromic material is analyzed. The possibilities of data reading methods with the use of fluorescence and four-photon techniques are compared.

  18. 3D direct writing fabrication of electrodes for electrochemical storage devices

    NASA Astrophysics Data System (ADS)

    Wei, Min; Zhang, Feng; Wang, Wei; Alexandridis, Paschalis; Zhou, Chi; Wu, Gang

    2017-06-01

    Among different printing techniques, direct ink writing is commonly used to fabricate 3D battery and supercapacitor electrodes. The major advantages of using the direct ink writing include effectively building 3D structure for energy storage devices and providing higher power density and higher energy density than traditional techniques due to the increased surface area of electrode. Nevertheless, direct ink writing has high standards for the printing inks, which requires high viscosity, high yield stress under shear and compression, and well-controlled viscoelasticity. Recently, a number of 3D-printed energy storage devices have been reported, and it is very important to understand the printing process and the ink preparation process for further material design and technology development. We discussed current progress of direct ink writing technologies by using various electrode materials including carbon nanotube-based material, graphene-based material, LTO (Li4Ti5O12), LFP (LiFePO4), LiMn1-xFexPO4, and Zn-based metallic oxide. Based on achieve electrochemical performance, these 3D-printed devices deliver performance comparable to the energy storage device fabricated using traditional methods still leaving large room for further improvement. Finally, perspectives are provided on the potential future direction of 3D printing for all solid-state electrochemical energy storage devices.

  19. .

    NASA Astrophysics Data System (ADS)

    Liu, Yuan; Zhu, Qing

    2017-07-01

    In order to achieve the simulation of elaborate stroke trajectories in Chinese calligraphy, this paper puts forward the innovative researching on writing momentum in the field of non-photorealistic rendering in the first time. Through the analysis of using pen in Chinese calligraphy, the writing momentum is divided into three parts: the center, the side and the back of writing brush by the judgment of the angle of brush holder. We design an algorithm for dynamic outputting writing rendering based on brush model. According to monitoring parameters such as the direction, position and normalized pressure of using pen, we calculate parameters like the footprint direction, the shape, size and nib bending after writing. The algorithm can also judge the dynamic writing trend of stroke trajectories, even automatic generate stroke trajectories by the algorithm forecasted. We achieve a more delicate rendering of Chinese calligraphy to enhance the user's operating results. And we finish the unique writing effect separated the Chinese calligraphy form other general writing results, which greatly enhances the Chinese calligraphy simulation. So that people who lack of writing skills can easily draw a beautiful charm font.

  20. 38 CFR 12.6 - Cases of living veterans.

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... administrator or executor or as directed in writing by such owner, or his or her executor or administrator. (2... or executor, or as directed in writing by such guardian, executor or administrator. (3) To the...

  1. Sub-100-nm trackwidth development by e-beam lithography for advanced magnetic recording heads

    NASA Astrophysics Data System (ADS)

    Chang, Jei-Wei; Chen, Chao-Peng

    2006-03-01

    Although semiconductor industry ramps the products with 90 nm much quicker than anticipated [1], magnetic recording head manufacturers still have difficulties in producing sub-100 nm read/write trackwidth. Patterning for high-aspectratio writer requires much higher depth of focus (DOF) than most advanced optical lithography, including immersion technique developed recently [2]. Self-aligning reader with its stabilized bias requires a bi-layer lift-off structure where the underlayer is narrower than the top image layer. As the reader's trackwidth is below 100nm, the underlayer becomes very difficult to control. Among available approaches, e-beam lithography remains the most promising one to overcome the challenge of progressive miniaturization. In this communication, the authors discussed several approaches using ebeam lithography to achieve sub-100 nm read/write trackwidth. Our studies indicated the suspended resist bridge design can not only widen the process window for lift-off process but also makes 65 nm trackwidth feasible to manufacture. Necked dog-bone structure seems to be the best design in this application due to less proximity effects from adjacent structures and minimum blockages for ion beam etching. The trackwidth smaller than 65 nm can be fabricated via the combination of e-beam lithography with auxiliary slimming and/or trimming. However, deposit overspray through undercut becomes dominated in such a small dimension. To minimize the overspray, the effects of underlayer thickness need to be further studied.

  2. Bridging the Gap: Contextualizing Professional Ethics in Collaborative Writing Projects

    ERIC Educational Resources Information Center

    Rice, J. A.

    2007-01-01

    Many business and technical writing students find classroom discussions of professional ethics interesting and enjoyable. However, when trying to incorporate the content of discussions directly into their writing practices, they often experience difficulties linking ethical concepts to writing process. This article discusses how instructors can…

  3. Initial benchmarking of a new electron-beam raster pattern generator for 130-100 nm maskmaking

    NASA Astrophysics Data System (ADS)

    Sauer, Charles A.; Abboud, Frank E.; Babin, Sergey V.; Chakarian, Varoujan; Ghanbari, Abe; Innes, Robert; Trost, David; Raymond, Frederick, III

    2000-07-01

    The decision by the Semiconductor Industry Association (SIA) to accelerate the continuing evolution to smaller linewidths is consistent with the commitment by Etec Systems, Inc. to rapidly develop new technologies for pattern generation systems with improved resolution, critical dimension (CD) uniformity, positional accuracy, and throughput. Current pattern generation designs are inadequate to meet the more advanced requirements for masks, particularly at or below the 100 nm node. Major changes to all pattern generation tools will be essential to meet future market requirements. An electron-beam (e-beam) system that is designed to meet the challenges for 130 - 100 nm device generation with extendibility to the 70-nm range will be discussed. This system has an architecture that includes a graybeam writing strategy, a new state system, and improved thermal management. Detailed changes include a pulse width modulated blanking system, per-pixel deflection, retrograde scanning multipass writing, and a column with a 50 kV accelerating voltage that supports a dose of up to 45 (mu) C/cm2 with minimal amounts of resist heating. This paper examines current issues, our approach to meeting International Technology Roadmap for Semiconductors (ITRS) requirements, and some preliminary results from a new pattern generator.

  4. Asymmetry of light absorption upon propagation of focused femtosecond laser pulses with spatiotemporal coupling through glass materials

    NASA Astrophysics Data System (ADS)

    Zhukov, Vladimir P.; Bulgakova, Nadezhda M.

    2017-05-01

    Ultrashort laser pulses are usually described in terms of temporal and spatial dependences of their electric field, assuming that the spatial dependence is separable from time dependence. However, in most situations this assumption is incorrect as generation of ultrashort pulses and their manipulation lead to couplings between spatial and temporal coordinates resulting in various effects such as pulse front tilt and spatial chirp. One of the most intriguing spatiotemporal coupling effects is the so-called "lighthouse effect", the phase front rotation with the beam propagation distance [Akturk et al., Opt. Express 13, 8642 (2005)]. The interaction of spatiotemporally coupled laser pulses with transparent materials have interesting peculiarities, such as the effect of nonreciprocal writing, which can be used to facilitate microfabrication of photonic structures inside optical glasses. In this work, we make an attempt to numerically investigate the influence of the pulse front tilt and the lighthouse effect on the absorption of laser energy inside fused silica glass. The model, which is based on nonlinear Maxwell's equations supplemented by the hydrodynamic equations for free electron plasma, is applied. As three-dimensional solution of such a problem would require huge computational resources, a simplified two-dimensional model has been proposed. It has enabled to gain a qualitative insight into the features of propagation of ultrashort laser pulses with the tilted front in the regimes of volumetric laser modification of transparent materials, including directional asymmetry upon direct laser writing in glass materials.

  5. The Effect of Concept Mapping on L2 Writing Performance: Examining Possible Effects of Trait-Level Writing Anxiety

    ERIC Educational Resources Information Center

    Machida, Naoko; Dalsky, David J.

    2014-01-01

    Research on anxiety in a foreign language-learning context is well-documented; however, few studies have directly focused on anxiety occurring within writing contexts despite the fact that writing anxiety is known to affect students' learning. The present study examined the effectiveness of concept mapping considering students' writing anxiety.…

  6. Direct laser writing of topographic features in semiconductor-doped glass

    NASA Astrophysics Data System (ADS)

    Smuk, Andrei Y.

    2000-11-01

    Patterning of glass and silica surfaces is important for a number of modern technologies, which depend on these materials for manufacturing of both final products, such as optics, and prototypes for casting and molding. Among the fields that require glass processing on microscopic scale are optics (lenses and arrays, diffractive/holographic elements, waveguides), biotechnology (capillary electrophoresis chips and biochemical libraries) and magnetic media (landing zones for magnetic heads). Currently, standard non-laser techniques for glass surface patterning require complex multi-step processes, such as photolithography. Work carried out at Brown has shown that semiconductor- doped glasses (SDG) allow a single-step patterning process using low power continuous-wave visible lasers. SDG are composite materials, which consist of semiconductor crystallites embedded into glass matrix. In this study, borosilicate glasses doped with CdSxSe1-x nanocrystals were used. Exposure of these materials to a low-power above- the-energy gap laser beam leads to local softening, and subsequent expansion and rapid solidification of the exposed volume, resulting in a nearly spherical topographic feature on the surface. The effects of the incident power, beam configuration, and the exposure time on the formation and final parameters of the microlens were studied. Based on the numerical simulation of the temperature distribution produced by the absorbed Gaussian beam, and the ideas of viscous flow at the temperatures around the glass transition point, a model of lens formation is suggested. The light intensity distribution in the near-field of the growing lens is shown to have a significant effect on the final lens height. Fabrication of dense arrays of microlenses is shown, and the thermal and structural interactions between the neighboring lenses were also studied. Two-dimensional continuous-profile topographic features are achieved by exposure of the moving substrates to the writing beam. By controlling the translation speed and the position of the sample, predefined extended structures, such as diffractive optical elements (blazed gratings, Dammann generators, Fresnel zone plates) can be produced with resolution of ~1μm. Below-the-surface patterning is achieved due to a selective etching of laser-written structures in hydrofluoric acid. Similar selective etching technique was developed for undoped borosilicate glasses by exposure to intense visible and UV radiation.

  7. Transoptr — A second order beam transport design code with optimization and constraints

    NASA Astrophysics Data System (ADS)

    Heighway, E. A.; Hutcheon, R. M.

    1981-08-01

    This code was written initially to design an achromatic and isochronous reflecting magnet and has been extended to compete in capability (for constrained problems) with TRANSPORT. Its advantage is its flexibility in that the user writes a routine to describe his transport system. The routine allows the definition of general variables from which the system parameters can be derived. Further, the user can write any constraints he requires as algebraic equations relating the parameters. All variables may be used in either a first or second order optimization.

  8. Formative Assessment and Writing: A Meta-Analysis

    ERIC Educational Resources Information Center

    Graham, Steve; Hebert, Michael; Harris, Karen R.

    2015-01-01

    To determine whether formative writing assessments that are directly tied to everyday classroom teaching and learning enhance students' writing performance, we conducted a meta-analysis of true and quasi-experiments conducted with students in grades 1 to 8. We found that feedback to students about writing from adults, peers, self, and computers…

  9. Playwriting: Not Just for Dramatists.

    ERIC Educational Resources Information Center

    Robbins, Bruce

    Playwriting gives students focused experience with dialogue, which is useful in many kinds of writing, and provides an avenue for process-based writing instruction. The assignment of writing plays allows students to try out various personae without risking direct self-identification. Students write more for one another than for the teacher,…

  10. Predicting Students' Writing Performance on the NAEP from Student- and State-Level Variables

    ERIC Educational Resources Information Center

    Mo, Ya; Troia, Gary A.

    2017-01-01

    This study examines the relationship between students' demographic background and their experiences with writing at school, the alignment between state and National Assessment of Educational Progress (NAEP) direct writing assessments, and students' NAEP writing performance. The study utilizes primary data collection via content analysis of writing…

  11. Motivational Scaffolding, Politeness, and Writing Center Tutoring

    ERIC Educational Resources Information Center

    Mackiewicz, Jo; Thompson, Isabelle

    2013-01-01

    Writing center tutors know that improving writing skills requires sustained effort over a long period of time. They also know that motivation--the drive to actively invest in sustained effort toward a goal--is essential for writing improvement. Because motivation can direct attention toward particular tasks and increase both effort and…

  12. Laser processing with specially designed laser beam

    NASA Astrophysics Data System (ADS)

    Asratyan, A. A.; Bulychev, N. A.; Feofanov, I. N.; Kazaryan, M. A.; Krasovskii, V. I.; Lyabin, N. A.; Pogosyan, L. A.; Sachkov, V. I.; Zakharyan, R. A.

    2016-04-01

    The possibility of using laser systems to form beams with special spatial configurations has been studied. The laser systems applied had a self-conjugate cavity based on the elements of copper vapor lasers (LT-5Cu, LT-10Cu, LT-30Cu) with an average power of 5, 10, or 30 W. The active elements were pumped by current pulses of duration 80-100 ns. The duration of laser generation pulses was up to 25 ns. The generator unit included an unstable cavity, where one reflector was a special mirror with a reflecting coating. Various original optical schemes used were capable of exploring spatial configurations and energy characteristics of output laser beams in their interaction with micro- and nanoparticles fabricated from various materials. In these experiments, the beam dimensions of the obtained zones varied from 0.3 to 5 µm, which is comparable with the minimum permissible dimensions determined by the optical elements applied. This method is useful in transforming a large amount of information at the laser pulse repetition rate of 10-30 kHz. It was possible to realize the high-precision micromachining and microfabrication of microscale details by direct writing, cutting and drilling (with the cutting width and through-hole diameters ranging from 3 to 100 µm) and produce microscale, deep, intricate and narrow grooves on substrate surfaces of metals and nonmetal materials. This system is used for producing high-quality microscale details without moving the object under treatment. It can also be used for microcutting and microdrilling in a variety of metals such as molybdenum, copper and stainless steel, with a thickness of up to 300 µm, and in nonmetals such as silicon, sapphire and diamond with a thickness ranging from 10 µm to 1 mm with different thermal parameters and specially designed laser beam.

  13. Direct comparison of the performance of commonly used e-beam resists during nano-scale plasma etching of Si, SiO2, and Cr

    NASA Astrophysics Data System (ADS)

    Goodyear, Andy; Boettcher, Monika; Stolberg, Ines; Cooke, Mike

    2015-03-01

    Electron beam writing remains one of the reference pattern generation techniques, and plasma etching continues to underpin pattern transfer. We report a systematic study of the plasma etch resistance of several e-beam resists, both negative and positive as well as classical and Chemically Amplified Resists: HSQ[1,2] (Dow Corning), PMMA[3] (Allresist GmbH), AR-P6200 (Allresist GmbH), ZEP520 (Zeon Corporation), CAN028 (TOK), CAP164 (TOK), and an additional pCAR (non-disclosed provider). Their behaviour under plasma exposure to various nano-scale plasma etch chemistries was examined (SF6/C4F8 ICP silicon etch, CHF3/Ar RIE SiO2 etch, Cl2/O2 RIE and ICP chrome etch, and HBr ICP silicon etch). Samples of each resist type were etched simultaneously to provide a direct comparison of their etch resistance. Resist thicknesses (and hence resist erosion rates) were measured by spectroscopic ellipsometer in order to provide the highest accuracy for the resist comparison. Etch selectivities (substrate:mask etch rate ratio) are given, with recommendations for the optimum resist choice for each type of etch chemistry. Silicon etch profiles are also presented, along with the exposure and etch conditions to obtain the most vertical nano-scale pattern transfer. We identify one resist that gave an unusually high selectivity for chlorinated and brominated etches which could enable pattern transfer below 10nm without an additional hard mask. In this case the resist itself acts as a hard mask. We also highlight the differing effects of fluorine and bromine-based Silicon etch chemistries on resist profile evolution and hence etch fidelity.

  14. Bio-inspired direct patterning functional nanothin microlines: controllable liquid transfer.

    PubMed

    Wang, Qianbin; Meng, Qingan; Wang, Pengwei; Liu, Huan; Jiang, Lei

    2015-04-28

    Developing a general and low-cost strategy that enables direct patterning of microlines with nanometer thickness from versatile liquid-phase functional materials and precise positioning of them on various substrates remains a challenge. Herein, with inspiration from the oriental wisdom to control ink transfer by Chinese brushes, we developed a facile and general writing strategy to directly pattern various functional microlines with homogeneous distribution and nanometer-scale thickness. It is demonstrated that the width and thickness of the microlines could be well-controlled by tuning the writing method, providing guidance for the adaptation of this technique to various systems. It is also shown that various functional liquid-phase materials, such as quantum dots, small molecules, polymers, and suspensions of nanoparticles, could directly write on the substrates with intrinsic physicochemical properties well-preserved. Moreover, this technique enabled direct patterning of liquid-phase materials on certain microdomains, even in multiple layered style, thus a microdomain localized chemical reaction and the patterned surface chemical modification were enabled. This bio-inspired direct writing device will shed light on the template-free printing of various functional micropatterns, as well as the integrated functional microdevices.

  15. Direct-write 3D printing of composite materials with magnetically aligned discontinuous reinforcement

    NASA Astrophysics Data System (ADS)

    Martin, Joshua J.; Caunter, Andrew; Dendulk, Amy; Goodrich, Scott; Pembroke, Ryan; Shores, Dan; Erb, Randall M.

    2017-05-01

    Three-dimensional (3D) printing of fiber reinforced composites represents an enabling technology that may bring toughness and specific strength to complex parts. Recently, direct-write 3D printing has been offered as a promising route to manufacturing fiber reinforced composites that show high specific strength. These approaches primarily rely on the use of shear-alignment during the extrusion process to align fibers along the printing direction. Shear alignment prevents fibers from being oriented along principle stress directions of the final designed part. This paper describes a new direct-write style 3D printing system that incorporates magnetic fields to actively control the orientation of reinforcing fibers during the printing of fiber reinforced composites. Such a manufacturing system is fraught with complications from the high shear dominated alignment experienced by the fibers during extrusion to the slow magnetic alignment dynamics of fibers in viscous media. Here we characterize these issues and suggest effective operating windows in which magnetic alignment is a viable approach to orienting reinforcing particles during direct-write 3D printing.

  16. Effects of directed written disclosure on grief and distress symptoms among bereaved individuals.

    PubMed

    Lichtenthal, Wendy G; Cruess, Dean G

    2010-07-01

    Bereavement-specific written disclosure trials have generally demonstrated null effects, but these studies have not directed the focus of writing. This randomized controlled trial compared directed writing that focused on either sense-making or benefit-finding, both associated with adjustment to loss, to traditional, non-directed emotional disclosure and a control condition. Bereaved undergraduates (n = 68) completed three 20-min writing sessions over 1 week. Intervention effects were found on prolonged grief disorder, depressive, and posttraumatic stress symptoms 3 months postintervention, and the benefit-finding condition appeared particularly efficacious. Physical health improved over time in all treatment groups. Findings suggested that directing written disclosure on topics associated with adjustment to bereavement may be useful for grieving individuals.

  17. EFFECTS OF DIRECTED WRITTEN DISCLOSURE ON GRIEF AND DISTRESS SYMPTOMS AMONG BEREAVED INDIVIDUALS

    PubMed Central

    LICHTENTHAL, WENDY G.; CRUESS, DEAN G.

    2013-01-01

    Bereavement-specific written disclosure trials have generally demonstrated null effects, but these studies have not directed the focus of writing. This randomized controlled trial compared directed writing that focused on either sense-making or benefit-finding, both associated with adjustment to loss, to traditional, non-directed emotional disclosure and a control condition. Bereaved undergraduates (n = 68) completed three 20-min writing sessions over 1 week. Intervention effects were found on prolonged grief disorder, depressive, and posttraumatic stress symptoms 3 months postintervention, and the benefit-finding condition appeared particularly efficacious. Physical health improved over time in all treatment groups. Findings suggested that directing written disclosure on topics associated with adjustment to bereavement may be useful for grieving individuals. PMID:24482856

  18. The Effects of Stimulus Writing Modality To Produce Writing Fluency in the Primary Grades.

    ERIC Educational Resources Information Center

    Duross, Christine; And Others

    An action research project set out to increase students' writing fluency and investigate whether writing fluency varies as a function of writing prompts and directions given to students. Subjects were 62 students in a first-grade class, a second-grade class, and a fifth/sixth-grade Special Day class (all in this class are learning disabled) in a…

  19. "Our Zoo to You": The Link between Zoo Animals in the Classroom and Science and Literacy Concepts in First-Grade Journal Writing

    ERIC Educational Resources Information Center

    Wilson, Kathleen; Trainin, Guy; Laughridge, Virginia; Brooks, David; Wickless, Mimi

    2011-01-01

    This study examined first-grade students' journal writing to determine how placing live zoo animals in classrooms for science education links to students' emergent and early writing. Students were asked to write journal entries during the daily language arts period. Although no direct instruction in informational text writing was offered, teachers…

  20. Writing a Writing Assessment: Saying What You Want to Say Isn't as Simple as It Seems.

    ERIC Educational Resources Information Center

    Escoe, Adrienne

    Since acceptable writing is essential to success in job training programs and in many entry-level jobs, a writing sample was included in the Training and Employment Prerequisites Survey, a multiple-choice test about skills like mechanics, usage, and spelling. The two writing prompts asked students to give directions for finding a location in a…

  1. "Why are Your Kids Writing during Reading Time?"

    ERIC Educational Resources Information Center

    Harp, Bill

    1987-01-01

    Presents a hypothetical situation of an elementary school principal's concern at students writing during reading time, and offers a possible teacher's response with information about the direct tie between writing and reading improvement. (JC)

  2. Japanese citizens' attitude toward end-of-life care and advance directives: A qualitative study for members of medical cooperatives.

    PubMed

    Hirayama, Yoko; Otani, Takashi; Matsushima, Masato

    2017-12-01

    Japanese citizens are interested in choosing their own end-of-life care, but few have created their own advance directive. This study examined changes among Japanese citizens' attitudes toward end-of-life care and advance directives and explored factors that affected these attitudes. We conducted five focus groups with 48 participants in 2009 and 2010. All participants were members of health cooperatives in Tokyo. We identified many barriers and reasons for creating and writing down advance directives. Experience caring for dying people and having a serious disease affected attitudes toward advance directives. Some participants changed their attitude toward end-of-life care by writing their own advance directive. When someone is writing advance directives, asking about his/her past experience of caring may be helpful. And learning about or filling out advance directives may help to break down resistance to using these documents.

  3. United States Air Force High School Apprenticeship Program. 1990 Program Management Report. Volume 3

    DTIC Science & Technology

    1991-04-18

    User Guide Shelly Knupp 73 Computer-Aided Design (CAD) Area Christopher O’Dell 74 Electron Beam Lithography Suzette Yu 68 Flight Dynamics Laboratory 75...fabrication. I Mr. Ed Davis, for the background knowledge of device processes and I information on electron beam lithography . Captain Mike Cheney, for...researcher may write gates on to the wafer by a process called lithography . This is the most crucial and complex part of the process. Two types of proven

  4. Ion Source Development for a Compact Proton Beam Writing System III

    DTIC Science & Technology

    2013-06-28

    to yield ion beam with energies up to 3 keV. The electrical power required to operate multiple components (like RF Valve , Probe and Extraction...they are powered through an isolation transformer. The required gas, to be ionized in the RF ion source, is fed through a coarse needle valve ...connector, the system can be pumped down to 3×10-2 mbar using an oil roughing pump. Nitrogen gas is feed in by adjusting the gas regulating valve

  5. Liquid Crystal Bragg Gratings: Dynamic Optical Elements for Spatial Light Modulators (Preprint)

    DTIC Science & Technology

    2007-01-01

    of the index of refraction in a material . If the index of refraction can be strongly modulated on a pixel •sutherlandr@saic.com 1 • level, then a...two optical beams .~,incident on a photorefractive material write a grating, due to the generation of a periodic space-charge field inducing an index ...modification of the material’s optical properties proportional to the applied voltage. A "read" beam of light incident on the material is thus spatially

  6. Propagation of Ince-Gaussian beams in uniaxial crystals orthogonal to the optical axis

    NASA Astrophysics Data System (ADS)

    Xu, Y. Q.; Zhou, G. Q.

    2012-03-01

    An analytical propagation expression of an Ince-Gaussian beam in uniaxial crystals orthogonal to the optical axis is derived. The uniaxial crystal considered here has the property of the extraordinary refractive index being larger than the ordinary refractive index. The Ince-Gaussian beam in the transversal direction along the optical axis spreads more rapidly than that in the other transversal direction. With increasing the ratio of the extraordinary refractive index to the ordinary refractive index, the spreading of the Ince-Gaussian beam in the transversal direction along the optical axis increases and the spreading of the Ince-Gaussian beam in the other transversal direction decreases. The effective beam size in the transversal direction along the optical axis is always larger than that in the other transversal direction. When the even and odd modes of Ince-Gaussian beams exist simultaneously, the effective beam size in the direction along the optical axis of the odd Ince-Gaussian beam is smaller than that of the even Ince-Gaussian beam in the corresponding direction, and the effective beam size in the transversal direction orthogonal to the optical axis of the odd Ince-Gaussian beam is larger than that of the even Ince-Gaussian beam in the corresponding direction.

  7. Discovering the Common Grading Preferences, Patterns, and Policies of Those Who Assess Writing

    ERIC Educational Resources Information Center

    Chowske, Rebecca Dunn

    2013-01-01

    Although considerable attention has been directed at improving the quality of students' writing, the investigation and definition of "good writing" has remained primarily within the realm of the normative and prescriptive. Social scientists and humanists often clash over the definition of valid and reliable writing assessment, as well as…

  8. The Role of Cognitive and Affective Factors in Measures of L2 Writing

    ERIC Educational Resources Information Center

    Zabihi, Reza

    2018-01-01

    This study investigates the direct and/or indirect effects of some cognitive (working memory capacity) and affective (writing anxiety and writing self-efficacy) variables on the complexity, accuracy, and fluency (CAF) of second language (L2) learners' writings. To achieve this goal, 232 upper-intermediate English learners performed an automated…

  9. Virtual and Material Buildings: Construction and Constructivism in Architecture and Writing.

    ERIC Educational Resources Information Center

    Medway, Peter

    1996-01-01

    Endorses recent arguments for more study of writing that shapes and directs the production of material artifacts and for considering writing as one semiotic mode among others. Considers a case of "nonwritten" symbolic production, architectural design, for what it may suggest for the study and teaching of writing. (TB)

  10. Comparing Two Methods of Writing Instruction: Effects on Kindergarten Students' Reading Skills

    ERIC Educational Resources Information Center

    Jones, Cindy D'on; Reutzel, D. Ray; Fargo, Jamison D.

    2010-01-01

    This experimental study directly compared the effects of two prevalent forms of classroom writing instruction, interactive writing and writing workshop, on kindergarten students' acquisition of early reading skills. Repeated measures data was collected at four points over 16 weeks to monitor growth of 151 kindergarten students in phonological…

  11. The Consequences of Writing: Enhancing Learning in the Disciplines.

    ERIC Educational Resources Information Center

    Parker, Robert P.; Goodkin, Vera

    Intended for teachers of grades 7-16, this book discusses "heuristic" writing--writing that produces new, irreversible knowledge for the writer leading to a fuller understanding of the self and of the act of writing--as well as principles and practices having direct implications for a wide range of students. Chapter 1 examines the…

  12. High-purity 3D nano-objects grown by focused-electron-beam induced deposition.

    PubMed

    Córdoba, Rosa; Sharma, Nidhi; Kölling, Sebastian; Koenraad, Paul M; Koopmans, Bert

    2016-09-02

    To increase the efficiency of current electronics, a specific challenge for the next generation of memory, sensing and logic devices is to find suitable strategies to move from two- to three-dimensional (3D) architectures. However, the creation of real 3D nano-objects is not trivial. Emerging non-conventional nanofabrication tools are required for this purpose. One attractive method is focused-electron-beam induced deposition (FEBID), a direct-write process of 3D nano-objects. Here, we grow 3D iron and cobalt nanopillars by FEBID using diiron nonacarbonyl Fe2(CO)9, and dicobalt octacarbonyl Co2(CO)8, respectively, as starting materials. In addition, we systematically study the composition of these nanopillars at the sub-nanometer scale by atom probe tomography, explicitly mapping the homogeneity of the radial and longitudinal composition distributions. We show a way of fabricating high-purity 3D vertical nanostructures of ∼50 nm in diameter and a few micrometers in length. Our results suggest that the purity of such 3D nanoelements (above 90 at% Fe and above 95 at% Co) is directly linked to their growth regime, in which the selected deposition conditions are crucial for the final quality of the nanostructure. Moreover, we demonstrate that FEBID and the proposed characterization technique not only allow for growth and chemical analysis of single-element structures, but also offers a new way to directly study 3D core-shell architectures. This straightforward concept could establish a promising route to the design of 3D elements for future nano-electronic devices.

  13. High-purity 3D nano-objects grown by focused-electron-beam induced deposition

    NASA Astrophysics Data System (ADS)

    Córdoba, Rosa; Sharma, Nidhi; Kölling, Sebastian; Koenraad, Paul M.; Koopmans, Bert

    2016-09-01

    To increase the efficiency of current electronics, a specific challenge for the next generation of memory, sensing and logic devices is to find suitable strategies to move from two- to three-dimensional (3D) architectures. However, the creation of real 3D nano-objects is not trivial. Emerging non-conventional nanofabrication tools are required for this purpose. One attractive method is focused-electron-beam induced deposition (FEBID), a direct-write process of 3D nano-objects. Here, we grow 3D iron and cobalt nanopillars by FEBID using diiron nonacarbonyl Fe2(CO)9, and dicobalt octacarbonyl Co2(CO)8, respectively, as starting materials. In addition, we systematically study the composition of these nanopillars at the sub-nanometer scale by atom probe tomography, explicitly mapping the homogeneity of the radial and longitudinal composition distributions. We show a way of fabricating high-purity 3D vertical nanostructures of ˜50 nm in diameter and a few micrometers in length. Our results suggest that the purity of such 3D nanoelements (above 90 at% Fe and above 95 at% Co) is directly linked to their growth regime, in which the selected deposition conditions are crucial for the final quality of the nanostructure. Moreover, we demonstrate that FEBID and the proposed characterization technique not only allow for growth and chemical analysis of single-element structures, but also offers a new way to directly study 3D core-shell architectures. This straightforward concept could establish a promising route to the design of 3D elements for future nano-electronic devices.

  14. Microelectromechanical (MEM) thermal actuator

    DOEpatents

    Garcia, Ernest J [Albuquerque, NM; Fulcher, Clay W. G. [Sandia Park, NM

    2012-07-31

    Microelectromechanical (MEM) buckling beam thermal actuators are disclosed wherein the buckling direction of a beam is constrained to a desired direction of actuation, which can be in-plane or out-of-plane with respect to a support substrate. The actuators comprise as-fabricated, linear beams of uniform cross section supported above the substrate by supports which rigidly attach a beam to the substrate. The beams can be heated by methods including the passage of an electrical current through them. The buckling direction of an initially straight beam upon heating and expansion is controlled by incorporating one or more directional constraints attached to the substrate and proximal to the mid-point of the beam. In the event that the beam initially buckles in an undesired direction, deformation of the beam induced by contact with a directional constraint generates an opposing force to re-direct the buckling beam into the desired direction. The displacement and force generated by the movement of the buckling beam can be harnessed to perform useful work, such as closing contacts in an electrical switch.

  15. Writing instruction in kindergarten: examining an emerging area of research for children with writing and reading difficulties.

    PubMed

    Edwards, Lana

    2003-01-01

    This review examines the literature on how to teach kindergarten children with reading and writing difficulties how to write. Specifically, research on handwriting instruction, spelling instruction, and composition writing is discussed. Due to the limited number of empirical studies on writing that included kindergarten students with diagnosed reading and writing difficulties, selected studies conducted with the full range of kindergarten children, as well as studies conducted in the early elementary grades, are presented to highlight future directions for research.

  16. Photo-Induced Click Chemistry for DNA Surface Structuring by Direct Laser Writing.

    PubMed

    Kerbs, Antonina; Mueller, Patrick; Kaupp, Michael; Ahmed, Ishtiaq; Quick, Alexander S; Abt, Doris; Wegener, Martin; Niemeyer, Christof M; Barner-Kowollik, Christopher; Fruk, Ljiljana

    2017-04-11

    Oligonucleotides containing photo-caged dienes were prepared and shown to react quantitatively in a light-induced Diels-Alder cycloaddition with functional maleimides in aqueous solution within minutes. Due to its high yield and fast rate, the reaction was exploited for DNA surface patterning with sub-micrometer resolution employing direct laser writing (DLW). Functional DNA arrays were written by direct laser writing (DLW) in variable patterns, which were further encoded with fluorophores and proteins through DNA directed immobilization. This mild and efficient light-driven platform technology holds promise for the fabrication of complex bioarrays with sub-micron resolution. © 2017 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.

  17. Optical read/write memory system components

    NASA Technical Reports Server (NTRS)

    Kozma, A.

    1972-01-01

    The optical components of a breadboard holographic read/write memory system have been fabricated and the parameters specified of the major system components: (1) a laser system; (2) an x-y beam deflector; (3) a block data composer; (4) the read/write memory material; (5) an output detector array; and (6) the electronics to drive, synchronize, and control all system components. The objectives of the investigation were divided into three concurrent phases: (1) to supply and fabricate the major components according to the previously established specifications; (2) to prepare computer programs to simulate the entire holographic memory system so that a designer can balance the requirements on the various components; and (3) to conduct a development program to optimize the combined recording and reconstruction process of the high density holographic memory system.

  18. Teaching High School Students How to Write: The Importance of Direct Explicit Instruction and Teacher Training

    ERIC Educational Resources Information Center

    Soiferman, L. Karen

    2017-01-01

    Learning how to teach writing is a skill just as learning how to write is a skill. Without a dedicated composition course in Education faculties pre-service teachers are not getting the training they require to be effective teachers of writing. In this report, a case is made for why teachers have to be more aware of how students learn to write and…

  19. Apparatus and methods for memory using in-plane polarization

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Liu, Junwei; Chang, Kai; Ji, Shuai-Hua

    A memory device includes a semiconductor layer with an in-plane polarization component switchable between a first direction and a second direction. A writing electrode is employed to apply a writing voltage to the semiconductor layer to change the in-plane polarization component between the first direction and the second direction. A reading electrode is employed to apply a reading voltage to the semiconductor layer to measure a tunneling current substantially perpendicular to the polarization direction of the in-plane polarization component. The directions of the reading voltage and the writing voltage are substantially perpendicular to each other. Therefore, the reading process ismore » non-destructive. Thin films (e.g., one unit cell thick) of ferroelectric material can be used in the memory device to increase the miniaturization of the device.« less

  20. Changes in Teachers' Beliefs after a Professional Development Project for Teaching Writing: Two Chinese Cases

    ERIC Educational Resources Information Center

    Teng, Lin Sophie

    2016-01-01

    A plethora of research has found that teachers' beliefs directly influence their classroom practices and teaching outcomes. While numerous studies in second/foreign language writing have examined the effectiveness of different innovative approaches on students' learning to write, there is a paucity of research on writing teachers' beliefs about…

  1. Operationalizing the Rubric: The Effect of Benchmark Selection on the Assessed Quality of Writing.

    ERIC Educational Resources Information Center

    Popp, Sharon E. Osborn; Ryan, Joseph M.; Thompson, Marilyn S.; Behrens, John T.

    The purposes of this study were to investigate the role of benchmark writing samples in direct assessment of writing and to examine the consequences of differential benchmark selection with a common writing rubric. The influences of discourse and grade level were also examined within the context of differential benchmark selection. Raters scored…

  2. Revision Strategies for Adolescent Writers: Moving Students in the Write Direction

    ERIC Educational Resources Information Center

    Borgese, Jolene; Heyler, Dick; Romano, Stephanie

    2011-01-01

    For many secondary students, writing effectively is the most elusive of the critical literacy skills needed for college and career readiness. And for many teachers, revision is the most difficult part of the writing process to tackle. How can adolescent writers be guided to revisit their work, to identify the weaknesses in their writing drafts,…

  3. Reduce, Reuse, Recycle: Resources and Strategies for the Use of Writing Projects in Mathematics

    ERIC Educational Resources Information Center

    Latulippe, Joe; Latulippe, Christine

    2014-01-01

    As an often recommended but under-utilized pedagogical strategy, writing in mathematics has many benefits for students. However, creating and grading worthwhile writing projects can be more time-consuming than utilizing more traditional forms of assessment. This paper provides a concrete example of a writing project prompt, questions, directions,…

  4. Improving Understanding in Ordinary Differential Equations through Writing in a Dynamical Environment

    ERIC Educational Resources Information Center

    Habre, Samer

    2012-01-01

    Research on writing in mathematics has shown that students learn more effectively in an environment that promotes this skill and that writing is most beneficial when it is directed at the learning aspect. Writing, however, necessitates proficiency on the part of the students that may not have been developed at earlier learning stages. Research has…

  5. "The Dilemma That Still Counts": Basic Writing at a Political Crossroads.

    ERIC Educational Resources Information Center

    Harrington, Susanmarie; Adler-Kassner, Linda

    1998-01-01

    Reviews definitions of basic writers and basic writing over the last 20 years. Argues that basic writers are not defined only in terms of institutional convenience. Offers future directions for basic writing research, suggesting that to learn more about basic writers, researchers must return to studies of error informed by basic writing's rich…

  6. Tilted pillar array fabrication by the combination of proton beam writing and soft lithography for microfluidic cell capture Part 2: Image sequence analysis based evaluation and biological application.

    PubMed

    Járvás, Gábor; Varga, Tamás; Szigeti, Márton; Hajba, László; Fürjes, Péter; Rajta, István; Guttman, András

    2018-02-01

    As a continuation of our previously published work, this paper presents a detailed evaluation of a microfabricated cell capture device utilizing a doubly tilted micropillar array. The device was fabricated using a novel hybrid technology based on the combination of proton beam writing and conventional lithography techniques. Tilted pillars offer unique flow characteristics and support enhanced fluidic interaction for improved immunoaffinity based cell capture. The performance of the microdevice was evaluated by an image sequence analysis based in-house developed single-cell tracking system. Individual cell tracking allowed in-depth analysis of the cell-chip surface interaction mechanism from hydrodynamic point of view. Simulation results were validated by using the hybrid device and the optimized surface functionalization procedure. Finally, the cell capture capability of this new generation microdevice was demonstrated by efficiently arresting cells from a HT29 cell-line suspension. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  7. Tilted pillar array fabrication by the combination of proton beam writing and soft lithography for microfluidic cell capture: Part 1 Design and feasibility.

    PubMed

    Rajta, Istvan; Huszánk, Robert; Szabó, Atilla T T; Nagy, Gyula U L; Szilasi, Szabolcs; Fürjes, Peter; Holczer, Eszter; Fekete, Zoltan; Járvás, Gabor; Szigeti, Marton; Hajba, Laszlo; Bodnár, Judit; Guttman, Andras

    2016-02-01

    Design, fabrication, integration, and feasibility test results of a novel microfluidic cell capture device is presented, exploiting the advantages of proton beam writing to make lithographic irradiations under multiple target tilting angles and UV lithography to easily reproduce large area structures. A cell capture device is demonstrated with a unique doubly tilted micropillar array design for cell manipulation in microfluidic applications. Tilting the pillars increased their functional surface, therefore, enhanced fluidic interaction when special bioaffinity coating was used, and improved fluid dynamic behavior regarding cell culture injection. The proposed microstructures were capable to support adequate distribution of body fluids, such as blood, spinal fluid, etc., between the inlet and outlet of the microfluidic sample reservoirs, offering advanced cell capture capability on the functionalized surfaces. The hydrodynamic characteristics of the microfluidic systems were tested with yeast cells (similar size as red blood cells) for efficient capture. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  8. Large-Scale Direct-Writing of Aligned Nanofibers for Flexible Electronics.

    PubMed

    Ye, Dong; Ding, Yajiang; Duan, Yongqing; Su, Jiangtao; Yin, Zhouping; Huang, Yong An

    2018-05-01

    Nanofibers/nanowires usually exhibit exceptionally low flexural rigidities and remarkable tolerance against mechanical bending, showing superior advantages in flexible electronics applications. Electrospinning is regarded as a powerful process for this 1D nanostructure; however, it can only be able to produce chaotic fibers that are incompatible with the well-patterned microstructures in flexible electronics. Electro-hydrodynamic (EHD) direct-writing technology enables large-scale deposition of highly aligned nanofibers in an additive, noncontact, real-time adjustment, and individual control manner on rigid or flexible, planar or curved substrates, making it rather attractive in the fabrication of flexible electronics. In this Review, the ground-breaking research progress in the field of EHD direct-writing technology is summarized, including a brief chronology of EHD direct-writing techniques, basic principles and alignment strategies, and applications in flexible electronics. Finally, future prospects are suggested to advance flexible electronics based on orderly arranged EHD direct-written fibers. This technology overcomes the limitations of the resolution of fabrication and viscosity of ink of conventional inkjet printing, and represents major advances in manufacturing of flexible electronics. © 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  9. Beam width evolution of astigmatic hollow Gaussian beams in highly nonlocal nonlinear media

    NASA Astrophysics Data System (ADS)

    Yang, Zhen-Feng; Jiang, Xue-Song; Yang, Zhen-Jun; Li, Jian-Xing; Zhang, Shu-Min

    We investigate the beam width evolution of astigmatic hollow Gaussian beams propagating in highly nonlocal nonlinear media. The input-power-induced different evolutions of the beam width are illustrated: (i) the beam widths in two transverse directions are compressed or broadened at the same time; (ii) the beam width in one transverse direction keeps invariant, and the other is compressed or broadened; (iii) furthermore, the beam width in one transverse direction is compressed, whereas it in the other transverse direction is broadened.

  10. Production and characterization of femtosecond laser-written double line waveguides in heavy metal oxide glasses

    NASA Astrophysics Data System (ADS)

    da Silva, Diego Silvério; Wetter, Niklaus Ursus; de Rossi, Wagner; Kassab, Luciana Reyes Pires; Samad, Ricardo Elgul

    2018-01-01

    We report the fabrication and characterization of double line waveguides directly written in tellurite and germanate glasses using a femtosecond laser delivering 30 μJ, 80 fs pulses at 4 kHz repetition rate. The double line waveguides produced presented internal losses inferior to 2.0 dB/cm. The output mode profile and the M2 measurements indicate multimodal guiding behavior. A better beam quality for the GeO2 - PbO waveguide was observed when compared with TeO2 - ZnO glass. Raman spectroscopy of the waveguides showed structural modification of the glassy network and indicates that a negative refractive index modification occurs at the focus of the laser beam, therefore allowing for light guiding in between two closely spaced laser written lines. The refractive index change at 632 nm is around 10-4, and the structural changes in the laser focal region of the writing, evaluated by Raman spectroscopy, corroborated our findings that these materials are potential candidates for optical waveguides and passive components. To the best of our knowledge, the two double line configuration demonstrated in the present work was not reported before for germanate or tellurite glasses.

  11. Using Laser-Induced Thermal Voxels to Pattern Diverse Materials at the Solid-Liquid Interface.

    PubMed

    Zarzar, Lauren D; Swartzentruber, B S; Donovan, Brian F; Hopkins, Patrick E; Kaehr, Bryan

    2016-08-24

    We describe a high-resolution patterning approach that combines the spatial control inherent to laser direct writing with the versatility of benchtop chemical synthesis. By taking advantage of the steep thermal gradient that occurs while laser heating a metal edge in contact with solution, diverse materials comprising transition metals are patterned with feature size resolution nearing 1 μm. We demonstrate fabrication of reduced metallic nickel in one step and examine electrical properties and air stability through direct-write integration onto a device platform. This strategy expands the chemistries and materials that can be used in combination with laser direct writing.

  12. Using laser-induced thermal voxels to pattern diverse materials at the solid–liquid interface

    DOE PAGES

    Zarzar, Lauren D.; Swartzentruber, B. S.; Donovan, Brian F.; ...

    2016-08-05

    We describe a high-resolution patterning approach that combines the spatial control inherent to laser direct writing with the versatility of benchtop chemical synthesis. By taking advantage of the steep thermal gradient that occurs while laser heating a metal edge in contact with solution, diverse materials comprising transition metals are patterned with feature size resolution nearing 1 μm. We demonstrate fabrication of reduced metallic nickel in one step and examine electrical properties and air stability through direct-write integration onto a device platform. In conclusion, this strategy expands the chemistries and materials that can be used in combination with laser direct writing.

  13. Photochromic gratings in sol gel films containing diazo sulfonamide chromophore

    NASA Astrophysics Data System (ADS)

    Kucharski, Stanisław; Janik, Ryszard

    2005-09-01

    The photochromic sol-gel hybrid materials were prepared by incorporation of an azo chromophore containing sulfonamide fragment into polysiloxane cross-linked network. The materials were used to form transparent films on glass by spin-coating and/or casting. The reversible change of refraction index of the films on illumination with white light was observed by ellipsometry. The experiments with two beam coupling (TBC) and four wave mixing (4 WM) arrangement with green or blue laser beams as writing beams showed formation of a diffraction grating. The diffraction efficiency of the first order was 0.025-0.038 which yielded refraction index modulation in the range of up to 0.0066.

  14. Towards manipulating relativistic laser pulses with micro-tube plasma lenses

    PubMed Central

    Ji, L. L.; Snyder, J.; Pukhov, A.; Freeman, R. R.; Akli, K. U.

    2016-01-01

    Efficient coupling of intense laser pulses to solid-density matter is critical to many applications including ion acceleration for cancer therapy. At relativistic intensities, the focus has been mainly on investigating various laser beams irradiating initially overdense flat interfaces with little or no control over the interaction. Here, we propose a novel approach that leverages recent advancements in 3D direct laser writing (DLW) of materials and high contrast lasers to manipulate the laser-matter interactions on the micro-scales. We demonstrate, via simulations, that usable intensities ≥1023 Wcm−2 could be achieved with current tabletop lasers coupled to micro-engineered plasma lenses. We show that these plasma optical elements act as a lens to focus laser light. These results open new paths to engineering light-matter interactions at ultra-relativistic intensities. PMID:26979657

  15. Dual axis translation apparatus and system for translating an optical beam and related method

    DOEpatents

    Cassidy, Kelly

    1991-01-01

    A dual axis translation device and system in accordance with this invention, for translating an optical beam along both an x-axis and a y-axis which are perpendicular to one another, has a beam directing means acting on said optical beam for directing the beam along a particular path transverse to said x and y axes. An arrangement supporting said beam directing means for movement in the x and y direction within a given plane is provided. The arrangement includes a first means for translating said beam directing means along the x-axis in said given plane in order to translate the beam along said x-axis. The arrangement comprises a second means for translating said beam directing means along the y-axis in said given plane in order to translate the beam along said y-axis.

  16. Quantum Plasmonics: Quantum Information at the Nanoscale

    DTIC Science & Technology

    2016-11-06

    journal. In total this project has thus far resulted in six journal articles. We are currently writing up an additional work, on direct quantum tomography...resulted in six journal articles. We are currently writing up an additional work, on direct quantum tomography on state entanglement in quantum

  17. Direct-write assembly of microperiodic planar and spanning ITO microelectrodes

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Ahn, Bok Y; Lorang, David J; Duoss, Eric B.

    2010-01-01

    Printed Sn-doped In{sub 2}O{sub 3} (ITO) microelectrodes are fabricated by direct-write assembly of sol–gel inks with varying concentration. This maskless, non-lithographic approach provides a facile route to patterning transparent conductive features in planar arrays and spanning architectures.

  18. 48 CFR 1852.242-70 - Technical direction.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... Direction (SEP 1993) (a) Performance of the work under this contract is subject to the written technical... the Contracting Officer in writing in accordance with NASA FAR Supplement 1842.270. “Technical... in writing by the COTR. (d) The Contractor shall proceed promptly with the performance of technical...

  19. Investigation of the Influence of a Writing-to-Learn Assignment on Student Understanding of Polymer Properties

    ERIC Educational Resources Information Center

    Finkenstaedt-Quinn, Solaire A.; Halim, Audrey S.; Chambers, Timothy G.; Moon, Alena; Goldman, R. S.; Gere, Anne Ruggles; Shultz, Ginger V.

    2017-01-01

    We conducted a study to examine how a writing-to-learn assignment influenced student learning of polymer behavior. In particular, we examined the role of specific content and a rhetorical framework as well as a structured writing process including peer review and revision. The student-generated writing was analyzed via a content-directed rubric.…

  20. Should We Outgrow Personal Writing? Polanyi and Perry on Reality, Truth, and Intellectual Development.

    ERIC Educational Resources Information Center

    Inkster, Robert P.

    The notion of "Personal Writing" has come under sustained attack from several different directions and for a variety of reasons, yet it is a concept that still retains usefulness for writing instructors. One problem with personal writing is that frequently students do not like it or feel it invades their privacy, despite the traditional…

  1. The Word Writing CAFE: Assessing Student Writing for Complexity, Accuracy, and Fluency

    ERIC Educational Resources Information Center

    Leal, Dorothy J.

    2005-01-01

    The Word Writing CAFE is a new assessment tool designed for teachers to evaluate objectively students' word-writing ability for fluency, accuracy, and complexity. It is designed to be given to the whole class at one time. This article describes the development of the CAFE and provides directions for administering and scoring it. The author also…

  2. Direct Writing of Three-Dimensional Macroporous Photonic Crystals on Pressure-Responsive Shape Memory Polymers.

    PubMed

    Fang, Yin; Ni, Yongliang; Leo, Sin-Yen; Wang, Bingchen; Basile, Vito; Taylor, Curtis; Jiang, Peng

    2015-10-28

    Here we report a single-step direct writing technology for making three-dimensional (3D) macroporous photonic crystal patterns on a new type of pressure-responsive shape memory polymer (SMP). This approach integrates two disparate fields that do not typically intersect: the well-established templating nanofabrication and shape memory materials. Periodic arrays of polymer macropores templated from self-assembled colloidal crystals are squeezed into disordered arrays in an unusual shape memory "cold" programming process. The recovery of the original macroporous photonic crystal lattices can be triggered by direct writing at ambient conditions using both macroscopic and nanoscopic tools, like a pencil or a nanoindenter. Interestingly, this shape memory disorder-order transition is reversible and the photonic crystal patterns can be erased and regenerated hundreds of times, promising the making of reconfigurable/rewritable nanooptical devices. Quantitative insights into the shape memory recovery of collapsed macropores induced by the lateral shear stresses in direct writing are gained through fundamental investigations on important process parameters, including the tip material, the critical pressure and writing speed for triggering the recovery of the deformed macropores, and the minimal feature size that can be directly written on the SMP membranes. Besides straightforward applications in photonic crystal devices, these smart mechanochromic SMPs that are sensitive to various mechanical stresses could render important technological applications ranging from chromogenic stress and impact sensors to rewritable high-density optical data storage media.

  3. DOE Office of Scientific and Technical Information (OSTI.GOV)

    Aoki, Kenji

    A read/write head for a magnetic tape includes an elongated chip assembly and a tape running surface formed in the longitudinal direction of the chip assembly. A pair of substantially spaced parallel read/write gap lines for supporting read/write elements extend longitudinally along the tape running surface of the chip assembly. Also, at least one groove is formed on the tape running surface on both sides of each of the read/write gap lines and extends substantially parallel to the read/write gap lines.

  4. Pervasive liquid metal based direct writing electronics with roller-ball pen

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Zheng, Yi; Zhang, Qin; Liu, Jing, E-mail: jliu@mail.ipc.ac.cn

    A roller-ball pen enabled direct writing electronics via room temperature liquid metal ink was proposed. With the rolling to print mechanism, the metallic inks were smoothly written on flexible polymer substrate to form conductive tracks and electronic devices. The contact angle analyzer and scanning electron microscope were implemented to disclose several unique inner properties of the obtained electronics. An ever high writing resolution with line width and thickness as 200 μm and 80 μm, respectively was realized. Further, with the administration of external writing pressure, GaIn{sub 24.5} droplets embody increasing wettability on polymer which demonstrates the pervasive adaptability of themore » roller-ball pen electronics.« less

  5. Promoting Self-Directed Revision in EFL Writing Classes

    ERIC Educational Resources Information Center

    Coomber, Matthew

    2016-01-01

    Second language writers need to develop the ability to revise their writing independently of third party advice; thus, it is important that teachers devise methods by which to promote habits of self-directed revision. This quasi-experimental study investigates three classroom activities designed to encourage students to independently revise essays…

  6. Final Report for Grant "Direct Writing via Novel Aromatic Ladder Polymer Precursors"

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    C. B. Gorman

    2010-10-29

    This report describes activities and findings under the above entitled grant. These pertain to the development of new synthetic routes to novel precursor polymers and oligomers that are applicable for conversion from electrical insulators to electrical conductors under the application of light (e.g. direct photolithographic writing)

  7. 48 CFR 1052.201-70 - Contracting Officer's Technical Representative (COTR) Designation and Authority.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... in writing. The term “technical direction” includes, without limitation, direction to the contractor... the actions of the contractor's employees. (d) Technical direction may be oral or in writing. The COTR... Technical Representative (COTR) Designation and Authority. 1052.201-70 Section 1052.201-70 Federal...

  8. Mirror writing: a tachistoscopic study of a woman suffering from migraine when writing with the right hand.

    PubMed

    Nakano, Mitsuko; Tanaka, Shigeki; Izuno, Kenji; Ichihara, Shigeru

    2012-01-01

    An experimental study was conducted with a young woman who had suddenly developed mirror writing in the right hand, which she used for writing. She was not cured for eight years. The patient was ambidextrous and had no medical complaints except for migraine with perceptual and sensory abnormalities, and an enlarged cavity of the septum pellucidum. A previous study using functional magnetic resonance imaging (fMRI), conducted when she imagined letters and wrote letters in the air with either hand, indicated that both her cerebral hemispheres were active. In the present study three experiments were conducted using a tachistoscope to explore the stage in the cognitive process when directional errors emerged. In the experiments, after independently being presented with Attneave's meaningless figures or letters to each hemisphere, participants were requested to do the following: (a) verbally respond whether the orientation of two consecutively shown figures were the same or different and the letters were standard or reversed; (b) distinguish the orientations with right and left hand movements other than by writing (by pushing a button); and (c) reproduce the stimuli (drawing) immediately after the presentation. Results showed a higher rate of incorrect directions only when drawings were reproduced by the right hand. Results also indicated that the woman's inaccurate judgment in direction emerged only when in writing and not at the perceptual level, or when responding with hand movements other than writing. Her migraine was cured after five years following the experiment. The mirror writing was cured 2-3 months later.

  9. Electric field controlled strain induced reversible switching of magnetization in Galfenol nanomagnets delineated on PMN-PT substrate

    NASA Astrophysics Data System (ADS)

    Ahmad, Hasnain; Atulasimha, Jayasimha; Bandyopadhyay, Supriyo

    We report a non-volatile converse magneto-electric effect in elliptical Galfenol (FeGa) nanomagnets of ~300 nm lateral dimensions and ~10nm thickness delineated on a PMN-PT substrate. This effect can be harnessed for energy-efficient non-volatile memory. The nanomagnets are fabricated with e-beam lithography and sputtering. Their major axes are aligned parallel to the direction in which the substrate is poled and they are magnetized in this direction with a magnetic field. An electric field in the opposite direction generates compressive strain in the piezoelectric substrate which is partially transferred to the nanomagnets and rotates their magnetization away from the major axes to metastable orientations. There they remain after the field is removed, resulting in non-volatility. Reversing the electric field generates tensile strain which returns the magnetization to the original state. The two states can encode two binary bits which can be written using the correct voltage polarity, resulting in non-toggle behavior. Scaled memory fashioned on this effect can exhibit write energy dissipation of only ~2 aJ. Work is supported by NSF under ECCS-1124714 and CCF-1216614. Sputtering was carried out at NIST Gaithersburg.

  10. What is technical writing? Prolegomenon to a contextual definition

    NASA Technical Reports Server (NTRS)

    Barton, B. F.; Barton, M. S.

    1981-01-01

    The question, "What is Technical Writing?", is addressed. Interest about the stance a teacher assumes in a classroom, the orientation of textbooks, and the shape of curricula are considered. Technical writing is considered of age, definitions abound and the time is ripe for a metaperspective on the question. This analyzes pitfalls in representative definitions of technical writing suggest a direction for future inquiry.

  11. The Computer-Based Writing Program: A Clinical Teaching Experience for Education Interns to Develop Professional Knowledge and Skills in Effective Instructional Writing Practices

    ERIC Educational Resources Information Center

    Painter, Diane D.

    2016-01-01

    The four-week university-sponsored summer Computer-based Writing (CBW) Program directed by the head of a special education initial teacher licensure program gave teaching interns opportunities to work with young struggling writers in a supervised clinical setting to address keyboarding skills, writing conventions and knowledge and application of…

  12. Electron beam directed energy device and methods of using same

    DOEpatents

    Retsky, Michael W.

    2007-10-16

    A method and apparatus is disclosed for an electron beam directed energy device. The device consists of an electron gun with one or more electron beams. The device includes one or more accelerating plates with holes aligned for beam passage. The plates may be flat or preferably shaped to direct each electron beam to exit the electron gun at a predetermined orientation. In one preferred application, the device is located in outer space with individual beams that are directed to focus at a distant target to be used to impact and destroy missiles. The aimings of the separate beams are designed to overcome Coulomb repulsion. A method is also presented for directing the beams to a target considering the variable terrestrial magnetic field. In another preferred application, the electron beam is directed into the ground to produce a subsurface x-ray source to locate and/or destroy buried or otherwise hidden objects including explosive devices.

  13. How To Improve Students' Writing Styles.

    ERIC Educational Resources Information Center

    Griffin, Beverly Norris

    Instructors often criticize student writing styles in abstract, nebulous terms which further serve to alienate student writers from the concept of style. College instructors should direct students to such concise, recognized discourses on improving writing style as Strunk and White's "The Elements of Style." In these manuals, specific, effective…

  14. Beam pointing direction changes in a misaligned Porro prism resonator

    NASA Astrophysics Data System (ADS)

    Lee, Jyh-Fa; Leung, Chung-Yee

    1988-07-01

    The relative change of the beam pointing direction for a misaligned Porro prism resonator has been analyzed, using an oscillation axis concept for the Porro prism resonator to find the beam direction. Expressions for the beam tilting angles are presented which show that the angular misalignment in the horizontal direction will result in beam tilting in both the horizontal and vertical directions. Good agreement between experimental and theoretical results is found.

  15. Writing Like a Scientist: Exploring Elementary Teachers' Understandings and Practices of Writing in Science

    NASA Astrophysics Data System (ADS)

    Glen, Nicole J.; Dotger, Sharon

    2013-10-01

    This qualitative study examined the connections between elementary teachers’ conceptions of how scientists use writing and how the teachers used writing during science lessons. Data collected included lesson observations, interviews, handouts to students, and curriculum resources. The findings revealed that teachers in this study thought scientists write for several purposes: the presentation of data, observations, experiences, procedures, and facts. The teachers used writing tasks that mirrored this with their students. The teachers also had a limited definition of creativity in writing, and when they had students write creatively in science it was to add in fictional elements. Implications of this study include providing teachers with better models for how and why scientists write, including these models in more inquiry-based science lessons, and directly relating concepts of nature of science to elementary science writing.

  16. Isotope separation apparatus and method

    DOEpatents

    Feldman, Barry J.

    1985-01-01

    The invention relates to an improved method and apparatus for laser isotope separation by photodeflection. A molecular beam comprising at least two isotopes to be separated intersects, preferably substantially perpendicular to one broad side of the molecular beam, with a laser beam traveling in a first direction. The laser beam is reflected back through the molecular beam, preferably in a second direction essentially opposite to the first direction. Because the molecules in the beam occupy various degenerate energy levels, if the laser beam comprises chirped pulses comprising selected wavelengths, the laser beam will very efficiently excite substantially all unexcited molecules and will cause stimulated emission of substantially all excited molecules of a selected one of the isotopes in the beam which such pulses encounter. Excitation caused by first direction chirped pulses moves molecules of the isotope excited thereby in the first direction. Stimulated emission of excited molecules of the isotope is brought about by returning chirped pulses traveling in the second direction. Stimulated emission moves emitting molecules in a direction opposite to the photon emitted. Because emitted photons travel in the second direction, emitting molecules move in the first direction. Substantial molecular movement of essentially all the molecules containing the one isotope is accomplished by a large number of chirped pulse-molecule interactions. A beam corer collects the molecules in the resulting enriched divergent portions of the beam.

  17. Smart Optical Material Characterization System and Method

    NASA Technical Reports Server (NTRS)

    Choi, Sang Hyouk (Inventor); Park, Yeonjoon (Inventor)

    2015-01-01

    Disclosed is a system and method for characterizing optical materials, using steps and equipment for generating a coherent laser light, filtering the light to remove high order spatial components, collecting the filtered light and forming a parallel light beam, splitting the parallel beam into a first direction and a second direction wherein the parallel beam travelling in the second direction travels toward the material sample so that the parallel beam passes through the sample, applying various physical quantities to the sample, reflecting the beam travelling in the first direction to produce a first reflected beam, reflecting the beam that passes through the sample to produce a second reflected beam that travels back through the sample, combining the second reflected beam after it travels back though the sample with the first reflected beam, sensing the light beam produced by combining the first and second reflected beams, and processing the sensed beam to determine sample characteristics and properties.

  18. Persistent Left Unilateral Mirror Writing: A Neuropsychological Case Study

    ERIC Educational Resources Information Center

    Angelillo, Valentina G.; De Lucia, Natascia; Trojano, Luigi; Grossi, Dario

    2010-01-01

    Mirror writing (MW) is a rare disorder in which a script runs in direction opposite to normal and individual letters are reversed. The disorder generally occurs after left-hemisphere lesions, is transient and is observed on the left hand, whereas usually motor impairments prevent assessment of direction of right handwriting. We describe a…

  19. Responding Electronically to Student Drafts on Campus: Dis/Encouraging Dialogue?

    ERIC Educational Resources Information Center

    Harran, M.; Knott, A.; Weir, C.

    2011-01-01

    This article reports on an investigation into whether writing centre (WC) respondents at an institution of Higher Education (HE) encourage or discourage draft dialogue (a conversation in writing) with students submitting drafts electronically to the WC for feedback. The writing respondents insert local feedback responses or comments directly onto…

  20. Bloomington Writing Assessment 1977; Student Exercise, Teacher Directions, Scoring.

    ERIC Educational Resources Information Center

    Bloomington Public Schools, MN.

    This booklet contains the 14 exercises that are used in the Bloomington, Minnesota, school system's writing assessment program. Depending on their applicability, the exercises may be used to assess the writing performance of fourth-, eighth-, or eleventh-grade students. Thirteen of the exercises are from the National Assessment of Educational…

  1. Motivation and Creativity: Effects of Motivational Orientation on Creative Writers.

    ERIC Educational Resources Information Center

    Amabile, Teresa M.

    This study directly tested the hypothesis that intrinsic motivation is conducive to creativity and extrinsic motivation is detrimental. Chosen because they identified themselves as actively involved in creative writing, 72 young adults participated in individual laboratory sessions where they were asked to write two brief poems. Before writing the…

  2. The Function of Text in a Dialogic Writing Course.

    ERIC Educational Resources Information Center

    Comprone, Joseph J.

    Focusing on recent composition theory, this paper offers suggestions for writing teachers in applying concepts of dialogic discourse directly to the pedagogy of the college writing course. The first section of the paper addresses the influence of the social constructionist work on interpretation theory by Richard Rorty, Clifford Geertz, and…

  3. Writing for Manufacturing Personnel.

    ERIC Educational Resources Information Center

    Mercer County Community Coll., Trenton, NJ.

    This document, developed by Mercer County Community College (New Jersey) and its partners, offers lists of topics covered in each day of a 24-day course designed to teach General Motors employees the following skills: document information; write clear directions and instructions; outline and organize thoughts and ideas; write memos and business…

  4. Necessity, Invention, and Other Mothers--Going Interdepartmental.

    ERIC Educational Resources Information Center

    Collins, Terence

    One direction in which English departments must turn in the search for effective methods of writing instruction is toward definition of responsibility for writing skills as an institution-wide concern. Any number of studies--a selection of which is included in an appended annotated bibliography--substantiate the premise that writing instruction…

  5. Asymmetric 2D spatial beam filtering by photonic crystals

    NASA Astrophysics Data System (ADS)

    Gailevicius, D.; Purlys, V.; Maigyte, L.; Gaizauskas, E.; Peckus, M.; Gadonas, R.; Staliunas, K.

    2016-04-01

    Spatial filtering techniques are important for improving the spatial quality of light beams. Photonic crystals (PhCs) with a selective spatial (angular) transmittance can also provide spatial filtering with the added benefit transversal symmetries, submillimeter dimensions and monolithic integration in other devices, such as micro-lasers or semiconductor lasers. Workable bandgap PhC configurations require a modulated refractive index with period lengths that are approximately less than the wavelength of radiation. This imposes technical limitations, whereby the available direct laser write (DLW) fabrication techniques are limited in resolution and refractive index depth. If, however, a deflection mechanism is chosen instead, a functional filter PhC can be produced that is operational in the visible wavelength regime. For deflection based PhCs glass is an attractive choice as it is highly stable medium. 2D and 3D PhC filter variations have already been produced on soda-lime glass. However, little is known about how to control the scattering of PhCs when approaching the smallest period values. Here we look into the internal structure of the initially symmetric geometry 2D PhCs and associating it with the resulting transmittance spectra. By varying the DLW fabrication beam parameters and scanning algorithms, we show that such PhCs contain layers that are comprised of semi-tilted structure voxels. We show the appearance of asymmetry can be compensated in order to circumvent some negative effects at the cost of potentially maximum scattering efficiency.

  6. Isotope separation apparatus and method

    DOEpatents

    Cotter, Theodore P.

    1982-12-28

    The invention relates to a method and apparatus for laser isotope separation by photodeflection. A molecular beam comprising at least two isotopes to be separated intersects, preferable substantially perpendicular to one broad side of the molecular beam, with a laser beam traveling in a first direction. The laser beam is reflected back through the molecular beam, preferably in a second direction essentially opposite to the first direction. The laser beam comprises .pi.-pulses of a selected wavelength which excite unexcited molecules, or cause stimulated emission of excited molecules of one of the isotopes. Excitation caused by first direction .pi.-pulses moves molecules of the isotope excited thereby in the first direction. Stimulated emission of excited molecules of the isotope is brought about by returning .pi.-pulses traveling in the second direction. Stimulated emission moves emitting molecules in a direction opposite to the photon emitted. Because emitted photons travel in the second direction, emitting molecules move in the first direction. Substantial molecular movement is accomplished by a large number of .pi.-pulse-molecule interactions. A beam corer collects the molecules in the resulting enriched divergent portions of the beam.

  7. Terahertz electrical writing speed in an antiferromagnetic memory

    PubMed Central

    Kašpar, Zdeněk; Campion, Richard P.; Baumgartner, Manuel; Sinova, Jairo; Kužel, Petr; Müller, Melanie; Kampfrath, Tobias

    2018-01-01

    The speed of writing of state-of-the-art ferromagnetic memories is physically limited by an intrinsic gigahertz threshold. Recently, realization of memory devices based on antiferromagnets, in which spin directions periodically alternate from one atomic lattice site to the next has moved research in an alternative direction. We experimentally demonstrate at room temperature that the speed of reversible electrical writing in a memory device can be scaled up to terahertz using an antiferromagnet. A current-induced spin-torque mechanism is responsible for the switching in our memory devices throughout the 12-order-of-magnitude range of writing speeds from hertz to terahertz. Our work opens the path toward the development of memory-logic technology reaching the elusive terahertz band. PMID:29740601

  8. Surface smoothening of the inherent roughness of micro-lenses fabricated with 2-photon lithography

    NASA Astrophysics Data System (ADS)

    Schift, Helmut; Kirchner, Robert; Chidambaram, Nachiappan; Altana, Mirco

    2018-01-01

    Two-photon polymerization by direct laser writing enables to write refractive micro-optical elements with sub-μm precision. The trajectories and layering during the direct writing process often result in roughness in the range of the writing increment, which has adverse effects for optical applications. Instead of increasing overlap between adjacent voxels, roughness in the range of 100 nm can be smoothed out by post-processing. For this a method known as TASTE was developed, which allows polishing of surfaces without changing the structural details or the overall shape. It works particularly well with thermoplastic polymers and enables sub-10 nm roughness. The optical quality was confirmed for an array with several 100 microlenses.

  9. Laser direct writing of carbon/Au composite electrodes for high-performance micro-supercapacitors

    NASA Astrophysics Data System (ADS)

    Cai, Jinguang; Watanabe, Akira; Lv, Chao

    2017-02-01

    Micro-supercapacitors with small size, light weight, flexibility while maintaining high energy and power output are required for portable miniaturized electronics. The fabrication methods and materials should be cost-effective, scalable, and easily integrated to current electronic industry. Carbon materials have required properties for high-performance flexible supercapacitors, including high specific surface areas, electrochemical stability, and high electrical conductivity, as well as the high mechanical tolerance. Laser direct writing method is a non-contact, efficient, single-step fabrication technique without requirements of masks, post-processing, and complex clean room, which is a useful patterning technique, and can be easily integrated with current electronic product lines for commercial use. Previously we have reported micro-supercapacitors fabricated by laser direct writing on polyimide films in air or Ar, which showed highcapacitive performance. However, the conductivity of the carbon materials is still low for fast charge-discharge use. Here, we demonstrated the fabrication of flexible carbon/Au composite high-performance MSCs by first laser direct writing on commercial polyimide films followed by spin-coating Au nanoparticles ink and second in-situ laser direct writing using the low-cost semiconductor laser. As-prepared micro-supercapacitors show an improved conductivity and capacitance of 1.17 mF/cm2 at a high scanning rate of 10,000 mV/s, which is comparable to the reported capacitance of carbon-based micro-supercapacitors. In addition, the micro-supercapacitors have high bend tolerance and long-cycle stability.

  10. Nonlinear effects during interaction of femtosecond doughnut-shaped laser pulses with glasses: overcoming intensity clamping

    NASA Astrophysics Data System (ADS)

    Bulgakova, Nadezhda M.; Zhukov, Vladimir P.; Fedoruk, Mikhail P.; Rubenchik, Alexander M.

    2017-05-01

    Interaction of femtosecond laser pulses with a bulk glass (fused silica as an example) has been studied numerically based on non-linear Maxwell's equations supplemented by the hydrodynamics-type equations for free electron plasma for the cases of Gaussian linearly-polarized and doughnut-shaped radially-polarized laser beams. For Gaussian pulses focused inside glass (800 nm wavelength, 45 fs duration, numerical aperture of 0.25), the free electron density in the laser-excited region remains subcritical while the locally absorbed energy density does not exceed 2000 J/cm3 in the range of pulse energies of 200 nJ - 2 μJ. For doughnut-shaped pulses, the initial high-intensity ring of light is shrinking upon focusing. Upon reaching a certain ionization level on its way, the light ring splits into two branches, one of which shrinks swiftly toward the beam axis well before the geometrical focus, leading to generation of supercritical free electron density. The second branch represents the laser light scattered by the electron plasma away from the beam axis. The final laserexcited volume represents a tube of 0.5-1 μm in radius and 10-15 μm long. The local maximum of absorbed energy can be more than 10 times higher compared to the case of Gaussian beams of the same energy. The corresponding pressure levels have been evaluated. It is anticipated that, in the case of doughnut-shaped pulses, the tube-like shape of the deposited energy should lead to implosion of material that can be used for improving the direct writing of high-refractive index optical structures inside glass or for achieving extreme thermodynamic states of matter.

  11. Mix & match electron beam & scanning probe lithography for high throughput sub-10 nm lithography

    NASA Astrophysics Data System (ADS)

    Kaestner, Marcus; Hofer, Manuel; Rangelow, Ivo W.

    2013-03-01

    The prosperous demonstration of a technique able to produce features with single nanometer (SN) resolution could guide the semiconductor industry into the desired beyond CMOS era. In the lithographic community immense efforts are being made to develop extreme ultra-violet lithography (EUVL) and multiple-e-beam direct-write systems as possible successor for next generation lithography (NGL). However, patterning below 20 nm resolution and sub-10 nm overlay alignment accuracy becomes an extremely challenging quest. Herein, the combination of electron beam lithography (EBL) or EUVL with the outstanding capabilities of closed-loop scanning proximal probe nanolithography (SPL) reveals a promising way to improve both patterning resolution and reproducibility in combination with excellent overlay and placement accuracy. In particular, the imaging and lithographic resolution capabilities provided by scanning probe microscopy (SPM) methods touches the atomic level, which expresses the theoretical limit of constructing nanoelectronic devices. Furthermore, the symbiosis between EBL (EUVL) and SPL expands the process window of EBL (EUVL) far beyond state-of-the-art allowing SPL-based pre- and post-patterning of EBL (EUVL) written features at critical dimension level with theoretically nanometer precise pattern overlay alignment. Moreover, we can modify the EBL (EUVL) pattern before as well as after the development step. In this paper we demonstrate proof of concept using the ultra-high resolution molecular glass resist calixarene. Therefor we applied Gaussian E-beam lithography system operating at 10 keV and a home-developed SPL set-up. The introduced Mix and Match lithography strategy enables a powerful use of our SPL set-up especially as post-patterning tool for inspection and repair functions below the sub-10 nm critical dimension level.

  12. Fabrication of low loss waveguide using fundamental light of Yb-based femtosecond laser (Conference Presentation)

    NASA Astrophysics Data System (ADS)

    Imai, Ryo; Konishi, Kuniaki; Yumoto, Junji; Gonokami, Makoto K.

    2017-03-01

    Laser direct writing of optical devices and circuits is attracted attention because of its ability of three-dimensional fabrication without any mask[1]. Recently, Yb-fiber or solid-state laser has been commonly used for fabrication in addition to traditional Ti:S laser. However, it is reported that waveguide cannot be fabricated in fused silica by using the fundamental light from Yb-based femtosecond laser[2]. Some groups reported on waveguide fabrication by using second-harmonic beam of such lasers[3], but wavelength conversion using nonlinear process has drawbacks such as destabilization of laser power and beam deformation by walk off. In this study, we investigated fabrication of low-loss waveguide in fused silica by using the fundamental beam (1030nm) from an Yb solid-state femtosecond laser with a pulse duration of 250 fs. The NA of focusing objective lens was 0.42. The fabricated waveguide was made to have a circular cross-section by shaping laser beam with a slit[4]. We fixed repetition rate to 150 kHz, and identified appropriate scan speed and pulse energy for fabrication of low loss waveguide. Waveguide fabricated with appropriate condition had a propagation loss of 0.2 dB/cm, and this is the first report on optical waveguides in a fused silica fabricated by femto-second laser pulses at a wavelength of 1030nm. [1]K. M. Davis, et. al., Opt. Lett 21, 1729(1996) [2]J. Canning, et. al., Opt. Mater. Express 1, 998(2011) [3]L. Shah, et. al., Opt. Express 13, 1999(2005) [4]M. Ams, et. al., Opt. Express 13, 5676(2005)

  13. Persistent left unilateral mirror writing: A neuropsychological case study.

    PubMed

    Angelillo, Valentina G; De Lucia, Natascia; Trojano, Luigi; Grossi, Dario

    2010-09-01

    Mirror writing (MW) is a rare disorder in which a script runs in direction opposite to normal and individual letters are reversed. The disorder generally occurs after left-hemisphere lesions, is transient and is observed on the left hand, whereas usually motor impairments prevent assessment of direction of right handwriting. We describe a left-handed patient with complete left hand mirror writing, still evident 2 years after a hemorrhagic stroke in left nucleo-capsular region. Since the patient could write with his right hand he underwent several writing tasks with either hand, and a thorough assessment to clarify the nature of MW. MW was evident in writing to dictation with left hand only, both in right and left hemispace, but the patient could modify his behavior when a verbal instruction was provided. No mirror errors were found in reading words, in copying geometric figures and in spatial orientation tasks. MW in our patient could be accounted for by a failure in automatic transformation of grapho-motor programs to write with the left hand. A lack of concern (a sort of anosodiaphoria) and a poor cognitive flexibility could contribute to long-term persistence of MW. 2010 Elsevier Inc. All rights reserved.

  14. Evaluation of photomask flatness compensation for extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Ballman, Katherine; Lee, Christopher; Zimmerman, John; Dunn, Thomas; Bean, Alexander

    2016-10-01

    As the semiconductor industry continues to strive towards high volume manufacturing for EUV, flatness specifications for photomasks have decreased to below 10nm for 2018 production, however the current champion masks being produced report P-V flatness values of roughly 50nm. Write compensation presents the promising opportunity to mitigate pattern placement errors through the use of geometrically adjusted target patterns which counteract the reticle's flatness induced distortions and address the differences in chucking mechanisms between e-beam write and electrostatic clamping during scan. Compensation relies on high accuracy flatness data which provides the critical topographical components of the reticle to the write tool. Any errors included in the flatness data file are translated to the pattern during the write process, which has now driven flatness measurement tools to target a 6σ reproducibility <1nm. Using data collected from a 2011 Sematech study on the Alpha Demo Tool, the proposed methodology for write compensation is validated against printed wafer results. Topographic features which lack compensation capability must then be held to stringent specifications in order to limit their contributions to the final image placement error (IPE) at wafer. By understanding the capabilities and limitations of write compensation, it is then possible to shift flatness requirements towards the "non-correctable" portion of the reticle's profile, potentially relieving polishers from having to adhere to the current single digit flatness specifications.

  15. Substrate thermal conductivity controls the ability to manufacture microstructures via laser-induced direct write

    NASA Astrophysics Data System (ADS)

    Tomko, John A.; Olson, David H.; Braun, Jeffrey L.; Kelliher, Andrew P.; Kaehr, Bryan; Hopkins, Patrick E.

    2018-01-01

    In controlling the thermal properties of the surrounding environment, we provide insight into the underlying mechanisms driving the widely used laser direct write method for additive manufacturing. We find that the onset of silver nitrate reduction for the formation of direct write structures directly corresponds to the calculated steady-state temperature rises associated with both continuous wave and high-repetition rate, ultrafast pulsed laser systems. Furthermore, varying the geometry of the heat affected zone, which is controllable based on in-plane thermal diffusion in the substrate, and laser power, allows for control of the written geometries without any prior substrate preparation. These findings allow for the advance of rapid manufacturing of micro- and nanoscale structures with minimal material constraints through consideration of the laser-controllable thermal transport in ionic liquid/substrate media.

  16. Construction of meaning in the authentic science writing of deaf students.

    PubMed

    Lang, H G; Albertini, J A

    2001-01-01

    This study examines how students construct meaning through writing during authentic science activities. To determine how well students understood science concepts, we analyzed 228 writing samples from deaf students in grades 6 through 11 as well as the explanatory and reflective comments of their teachers. The analyses indicate that certain process writing strategies were differentially useful in helping deaf students to construct meaning and in allowing teachers to evaluate the constructed meaning. Three instructional conditions and two teacher variables were found to play roles in determining the accuracy and adequacy of the writing: (1) the writing prompts the teachers used, (2) the focus for the writing, (3) follow-up to the initial writing activity, (4) the teacher's content knowledge, and (5) the teacher's ability to interpret student writing. The authors recommend future applications of writing-to-learn strategies and suggest directions for further research and changes in teacher education.

  17. Kindergarten Predictors of Third Grade Writing

    PubMed Central

    Kim, Young-Suk; Al Otaiba, Stephanie; Wanzek, Jeanne

    2015-01-01

    The primary goal of the present study was to examine the relations of kindergarten transcription, oral language, word reading, and attention skills to writing skills in third grade. Children (N = 157) were assessed on their letter writing automaticity, spelling, oral language, word reading, and attention in kindergarten. Then, they were assessed on writing in third grade using three writing tasks – one narrative and two expository prompts. Children’s written compositions were evaluated in terms of writing quality (the extent to which ideas were developed and presented in an organized manner). Structural equation modeling showed that kindergarten oral language and lexical literacy skills (i.e., word reading and spelling) were independently predicted third grade narrative writing quality, and kindergarten literacy skill uniquely predicted third grade expository writing quality. In contrast, attention and letter writing automaticity were not directly related to writing quality in either narrative or expository genre. These results are discussed in light of theoretical and practical implications. PMID:25642118

  18. Challenges and requirements of mask data processing for multi-beam mask writer

    NASA Astrophysics Data System (ADS)

    Choi, Jin; Lee, Dong Hyun; Park, Sinjeung; Lee, SookHyun; Tamamushi, Shuichi; Shin, In Kyun; Jeon, Chan Uk

    2015-07-01

    To overcome the resolution and throughput of current mask writer for advanced lithography technologies, the platform of e-beam writer have been evolved by the developments of hardware and software in writer. Especially, aggressive optical proximity correction (OPC) for unprecedented extension of optical lithography and the needs of low sensitivity resist for high resolution result in the limit of variable shaped beam writer which is widely used for mass production. The multi-beam mask writer is attractive candidate for photomask writing of sub-10nm device because of its high speed and the large degree of freedom which enable high dose and dose modulation for each pixel. However, the higher dose and almost unlimited appetite for dose modulation challenge the mask data processing (MDP) in aspects of extreme data volume and correction method. Here, we discuss the requirements of mask data processing for multi-beam mask writer and presents new challenges of the data format, data flow, and correction method for user and supplier MDP tool.

  19. The Tablet Inscribed: Inclusive Writing Instruction with the iPad

    ERIC Educational Resources Information Center

    Sullivan, Rebecca M.

    2013-01-01

    Despite the author's initial skepticism, a classroom set of iPads has reinforced a student-directed approach to writing instruction, while also supporting an inclusive classroom. Using the iPads, students guide their writing process with access to the learning management system, electronic information resources, and an online text editor. Students…

  20. Balancing Self-Directed Learning with Expert Mentoring: The Science Writing Heuristic Approach

    ERIC Educational Resources Information Center

    Shelley, Mack; Fostvedt, Luke; Gonwa-Reeves, Christopher; Baenziger, Joan; McGill, Michael; Seefeld, Ashley; Hand, Brian; Therrien, William; Taylor, Jonte; Villanueva, Mary Grace

    2012-01-01

    This study focuses on the implementation of the Science Writing Heuristic (SWH) curriculum (Hand, 2007), which combines current understandings of learning as a cognitive and negotiated process with the techniques of argument-based inquiry, critical thinking skills, and writing to strengthen student outcomes. Success of SWH is dependent on the…

  1. The Effects of Teacher Directed Writing Instruction Combined with SOLO Literacy Suite

    ERIC Educational Resources Information Center

    Park, Y.; Ambrose, G.; Coleman, M. B.; Moore, T. C.

    2017-01-01

    The purpose of this study was to examine the effectiveness of an intervention in which teacher-led instruction was combined with computerized writing software to improve paragraph writing for three middle school students with intellectual disability. A multiple probe across participants design was used to evaluate the effectiveness of the…

  2. Technical Writing 1987: Galloping Off in at Least Two Directions.

    ERIC Educational Resources Information Center

    Stohrer, Freda F.

    Technical writing instructors generally agree about the absolute need for communication skills throughout the technological work place, but a survey of technical writing journal articles shows a lack of focus on ways to address business's needs for on-the-job literacy. One major advance within the profession in recent years has been the…

  3. "Make It New": Introducing Poetry Through Writing Poetry.

    ERIC Educational Resources Information Center

    Lim, Shirley

    One approach to introducing students to poetry is to have them write and analyze their own poems. Although this approach has some disadvantages, it does serve to tap students' experiences and expressive potential with creative projects and to give them an immediate and direct relationship with the traditional published works. By writing poems…

  4. Mentor Texts and the Coding of Academic Writing Structures: A Functional Approach

    ERIC Educational Resources Information Center

    Escobar Alméciga, Wilder Yesid; Evans, Reid

    2014-01-01

    The purpose of the present pedagogical experience was to address the English language writing needs of university-level students pursuing a degree in bilingual education with an emphasis in the teaching of English. Using mentor texts and coding academic writing structures, an instructional design was developed to directly address the shortcomings…

  5. Student Writing Standards: A Descending Spiral or a Bold New Direction?

    ERIC Educational Resources Information Center

    McKinney, Margaret; Comadina Granson, Ruben

    2013-01-01

    Many academics speak of a "literacy crisis" when referring to student writing standards, often pointing the finger of blame at an overall increase in social networking. The resulting tendency has been for language teachers in higher education to take a corrective, or even remedial, approach to writing fluency. This paper examines…

  6. Writing Conferences and Some Applications for the EFL Classroom.

    ERIC Educational Resources Information Center

    Renner, Christopher

    1990-01-01

    A teacher of English as a Foreign Language (EFL) to adults in a non-English-speaking country describes use of classroom writing conferences to improve student language use and introduce writing into the communicative syllabus. The approach is based on a conference format and focuses on self-directed inquiry. Students are provided with monolingual…

  7. International Conference on Integrated Optical Circuit Engineering, 1st, Cambridge, MA, October 23-25, 1984, Proceedings

    NASA Astrophysics Data System (ADS)

    Ostrowsky, D. B.; Sriram, S.

    Aspects of waveguide technology are explored, taking into account waveguide fabrication techniques in GaAs/GaAlAs, the design and fabrication of AlGaAs/GaAs phase couplers for optical integrated circuit applications, ion implanted GaAs integrated optics fabrication technology, a direct writing electron beam lithography based process for the realization of optoelectronic integrated circuits, and advances in the development of semiconductor integrated optical circuits for telecommunications. Other subjects examined are related to optical signal processing, optical switching, and questions of optical bistability and logic. Attention is given to acousto-optic techniques in integrated optics, acousto-optic Bragg diffraction in proton exchanged waveguides, optical threshold logic architectures for hybrid binary/residue processors, integrated optical modulation and switching, all-optic logic devices for waveguide optics, optoelectronic switching, high-speed photodetector switching, and a mechanical optical switch.

  8. Graphene Nanoribbons Fabricated by Helium Ion microscope

    NASA Astrophysics Data System (ADS)

    Pickard, D.; Oezyilmaz, B.; Thong, J.; Loh, K. P.; Viswanathan, V.; Zhongkai, A.; Mathew, S.; Kundu, T.; Park, C.; Yi, Z.; Xu, X.; Zhang, K.; Tat, T. C.; Wang, H.; Venkatesan, T.; Botton, G.; Couillard, M.

    2010-03-01

    Graphene, a monolayer graphitic lattice of carbon atoms has tremendous promise for a variety of applications on account of the zero mass of electrons, high mobility and the sensitivity of transport to perturbations at the interface. Patterning graphene is an obvious challenge and mesoscopic devices based on graphene require high spatial resolution patterning that will induce as little damage as possible. We use a helium ion microscope with its 0.4nm spot size beam to directly write patterns on free standing graphene films. TEM images of the patterns reveal holes as small as 4 nm and ribbons with line widths as narrow as 3 nm. The images show recovery of the graphene lattice at a distance of about a nm from the patterned edge. The linewidths of the ribbon can be varied considerably in a controllable fashion over ribbon lengths of the order of microns. . .

  9. Modification of transparent materials with ultrashort laser pulses: What is energetically and mechanically meaningful?

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Bulgakova, Nadezhda M., E-mail: nadezhda.bulgakova@hilase.cz; Institute of Thermophysics SB RAS, 1 Lavrentyev Ave., 630090 Novosibirsk; Zhukov, Vladimir P.

    A comprehensive analysis of laser-induced modification of bulk glass by single ultrashort laser pulses is presented which is based on combination of optical Maxwell-based modeling with thermoelastoplastic simulations of post-irradiation behavior of matter. A controversial question on free electron density generated inside bulk glass by ultrashort laser pulses in modification regimes is addressed on energy balance grounds. Spatiotemporal dynamics of laser beam propagation in fused silica have been elucidated for the regimes used for direct laser writing in bulk glass. 3D thermoelastoplastic modeling of material relocation dynamics under laser-induced stresses has been performed up to the microsecond timescale when allmore » motions in the material decay. The final modification structure is found to be imprinted into material matrix already at sub-nanosecond timescale. Modeling results agree well with available experimental data on laser light transmission through the sample and the final modification structure.« less

  10. Fabrication of parabolic cylindrical microlens array by shaped femtosecond laser

    NASA Astrophysics Data System (ADS)

    Luo, Zhi; Yin, Kai; Dong, Xinran; Duan, Ji'an

    2018-04-01

    A simple and efficient technique for fabricating parabolic cylindrical microlens arrays (CMLAs) on the surface of fused silica by shaped femtosecond (fs) laser direct-writing is demonstrated. By means of spatially shaping of a Gaussian fs laser beam to a Bessel distribution, an inversed cylindrical shape laser intensity profile is formed in a specific cross-sectional plane among the shaped optical field. Applying it to experiments, large area close-packed parabolic CMLAs with line-width of 37.5 μm and array size of about 5 × 5 mm are produced. The cross-sectional outline of obtained lenslets has a satisfied parabolic profile and the numerical aperture (NA) of lenslets is more than 0.35. Furthermore, the focusing performance of the fabricated CMLA is also tested in this work and it has been demonstrated that the focusing power of the CMLA with a parabolic profile is better than that with a semi-circular one.

  11. Nano-lithographically fabricated titanium dioxide based visible frequency three dimensional gap photonic crystal.

    PubMed

    Subramania, Ganapathi; Lee, Yun-Ju; Brener, Igal; Luk, Ting-Shan; Clem, Paul G

    2007-10-01

    Photonic crystals (PC) have emerged as important types of structures for light manipulation. Ultimate control of light is possible by creating PCs with a complete three dimensional (3D) gap [1, 2]. This has proven to be a considerable challenge in the visible and ultraviolet frequencies mainly due to complications in integrating transparent, high refractive index (n) materials with fabrication techniques to create ~ 100nm features with long range translational order. In this letter, we demonstrate a nano-lithography approach based on a multilevel electron beam direct write and physical vapor deposition, to fabricate four-layer titania woodpile PCs that potentially exhibit complete 3D gap at visible wavelengths. We achieved a short wavelength bandedge of 525nm with a 300nm lattice constant PC. Due to the nanoscale precision and capability for defect control, the nanolithography approach represents an important step toward novel visible photonic devices for lighting, lasers, sensing and biophotonics.

  12. Guideline Implementation: Energy-Generating Devices, Part 2-Lasers.

    PubMed

    Burlingame, Byron L

    2017-04-01

    Lasers have been used in the OR for many years and are essential tools in many different types of procedures. However, laser beams that come into contact with unintended targets directly or via reflection can cause injury to patients or personnel or pose other hazards, such as fires. The new AORN "Guideline for safe use of energy-generating devices" provides guidance on the use of all energy-generating devices in the OR. This article focuses on key points of the guideline that address the safe use of lasers. These include the components of the laser safety program, the responsibilities of the personnel in roles specific to use of a laser, laser safety measures, and documentation of laser use. Perioperative RNs should review the complete guideline for additional information and for guidance when writing and updating policies and procedures. Copyright © 2017 AORN, Inc. Published by Elsevier Inc. All rights reserved.

  13. Waveguides fabricated by femtosecond laser exploiting both depressed cladding and stress-induced guiding core.

    PubMed

    Dong, Ming-Ming; Wang, Cheng-Wei; Wu, Zheng-Xiang; Zhang, Yang; Pan, Huai-Hai; Zhao, Quan-Zhong

    2013-07-01

    We report on the fabrication of stress-induced optical channel waveguides and waveguide splitters with laser-depressed cladding by femtosecond laser. The laser beam was focused into neodymium doped phosphate glass by an objective producing a destructive filament. By moving the sample along an enclosed routine in the horizontal plane followed by a minor descent less than the filament length in the vertical direction, a cylinder with rarified periphery and densified center region was fabricated. Lining up the segments in partially overlapping sequence enabled waveguiding therein. The refractive-index contrast, near- and far-field mode distribution and confocal microscope fluorescence image of the waveguide were obtained. 1-to-2, 1-to-3 and 1-to-4 splitters were also machined with adjustable splitting ratio. Compared with traditional femtosecond laser writing methods, waveguides prepared by this approach showed controllable mode conduction, strong field confinement, large numerical aperture, low propagation loss and intact core region.

  14. Optical nano-woodpiles: large-area metallic photonic crystals and metamaterials.

    PubMed

    Ibbotson, Lindsey A; Demetriadou, Angela; Croxall, Stephen; Hess, Ortwin; Baumberg, Jeremy J

    2015-02-09

    Metallic woodpile photonic crystals and metamaterials operating across the visible spectrum are extremely difficult to construct over large areas, because of the intricate three-dimensional nanostructures and sub-50 nm features demanded. Previous routes use electron-beam lithography or direct laser writing but widespread application is restricted by their expense and low throughput. Scalable approaches including soft lithography, colloidal self-assembly, and interference holography, produce structures limited in feature size, material durability, or geometry. By multiply stacking gold nanowire flexible gratings, we demonstrate a scalable high-fidelity approach for fabricating flexible metallic woodpile photonic crystals, with features down to 10 nm produced in bulk and at low cost. Control of stacking sequence, asymmetry, and orientation elicits great control, with visible-wavelength band-gap reflections exceeding 60%, and with strong induced chirality. Such flexible and stretchable architectures can produce metamaterials with refractive index near zero, and are easily tuned across the IR and visible ranges.

  15. Direct ink write fabrication of transparent ceramic gain media

    NASA Astrophysics Data System (ADS)

    Jones, Ivy Krystal; Seeley, Zachary M.; Cherepy, Nerine J.; Duoss, Eric B.; Payne, Stephen A.

    2018-01-01

    Solid-state laser gain media based on the garnet structure with two spatially distinct but optically contiguous regions have been fabricated. Transparent gain media comprised of a central core of Y2.97Nd0.03Al5.00O12.00 (Nd:YAG) and an undoped cladding region of Y3Al5O12 (YAG) were fabricated by direct ink write and transparent ceramic processing. Direct ink write (DIW) was employed to form the green body, offering a general route to preparing functionally structured solid-state laser gain media. Fully-dense transparent optical ceramics in a "top hat" geometry with YAG/Nd:YAG have been fabricated by DIW methods with optical scatter at 1064 nm of <3%/cm.

  16. Flexible metal patterning in glass microfluidic structures using femtosecond laser direct-write ablation followed by electroless plating

    NASA Astrophysics Data System (ADS)

    Xu, Jian; Midorikawa, Katsumi; Sugioka, Koji

    2014-03-01

    A simple and flexible technique for integrating metal micropatterns into glass microfluidic structures based on threedimensional femtosecond laser microfabrication is presented. Femtosecond laser direct writing followed by thermal treatment and successive chemical etching allows us to fabricate three-dimensional microfluidic structures such as microchannels and microreservoirs inside photosensitive glass. Then, the femtosecond laser direct-write ablation followed by electroless metal plating enables space-selective deposition of patterned metal films on desired locations of internal walls of the fabricated microfluidic structures. The developed technique is applied to integrate a metal microheater into a glass microchannel to control the temperature of liquid samples in the channel, which can be used as a microreactor for enhancement of chemical reactions.

  17. Implementing a writing course in an online RN-BSN program.

    PubMed

    Stevens, Carol J; D'Angelo, Barbara; Rennell, Nathalie; Muzyka, Diann; Pannabecker, Virginia; Maid, Barry

    2014-01-01

    Scholarly writing is an essential skill for nurses to communicate new research and evidence. Written communication directly relates to patient safety and quality of care. However, few online RN-BSN programs integrate writing instruction into their curricula. Nurses traditionally learn how to write from instructor feedback and often not until midway into their baccalaureate education. Innovative strategies are needed to help nurses apply critical thinking skills to writing. The authors discuss a collaborative project between nursing faculty and technical communication faculty to develop and implement a writing course that is 1 of the 1st courses the students take in the online RN-BSN program.

  18. The writing process: A powerful approach for the language-disabled student.

    PubMed

    Moulton, J R; Bader, M S

    1985-01-01

    Our understanding of the writing process can be a powerful tool for teaching language-disabled students the "how" of writing. Direct, explicit instruction in writing process helps these students learn to explore their ideas and to manage the multiple demands of writing. A case study of one student, Jeff, demonstrates how we structure the stages of writing: prewriting, planning, drafting, revising, and proofreading. When these stages are clearly defined and involve specific skills, language-disabled students can reach beyond their limitations and strengthen their expression. The case study of Jeff reveals the development of his sense of control and his regard for himself as a writer.

  19. Maskless laser writing of microscopic metallic interconnects

    DOEpatents

    Maya, Leon

    1995-01-01

    A method of forming a metal pattern on a substrate. The method includes depositing an insulative nitride film on a substrate and irradiating a laser beam onto the nitride film, thus decomposing the metal nitride into a metal constituent and a gaseous constituent, the metal constituent remaining in the nitride film as a conductive pattern.

  20. Tetrahedral Hohlraum Visualization and Pointings

    NASA Astrophysics Data System (ADS)

    Klare, K. A.; Wallace, J. M.; Drake, D.

    1997-11-01

    In designing experiments for Omega, the tetrahedral hohlraum (a sphere with four holes) can make full use of all 60 beams. There are some complications: the beams must clear the laser entrance hole (LEH), must miss a central capsule, absolutely must not go out the other LEHs, and should distribute in the interior of the hohlraum to maximize the uniformity of irradiation on the capsule while keeping reasonable laser spot sizes. We created a 15-offset coordinate system with which an IDL program computes clearances, writes a file for QuickDraw 3D (QD3D) visualization, and writes input for the viewfactor code RAYNA IV. Visualizing and adjusting the parameters by eye gave more reliable results than computer optimization. QD3D images permitted quick live rotations to determine offsets. The clearances obtained insured safe operation and good physics. The viewfactor code computes the initial irradiation of the hohlraum and capsule or of a uniform hohlraum source with the loss through the four LEHs and shows a high degree of uniformity with both, better for lasers because this deposits more energy near the LEHs to compensate for the holes.

  1. Beam masking to reduce cyclic error in beam launcher of interferometer

    NASA Technical Reports Server (NTRS)

    Ames, Lawrence L. (Inventor); Bell, Raymond Mark (Inventor); Dutta, Kalyan (Inventor)

    2005-01-01

    Embodiments of the present invention are directed to reducing cyclic error in the beam launcher of an interferometer. In one embodiment, an interferometry apparatus comprises a reference beam directed along a reference path, and a measurement beam spatially separated from the reference beam and being directed along a measurement path contacting a measurement object. The reference beam and the measurement beam have a single frequency. At least a portion of the reference beam and at least a portion of the measurement beam overlapping along a common path. One or more masks are disposed in the common path or in the reference path and the measurement path to spatially isolate the reference beam and the measurement beam from one another.

  2. Substrate thermal conductivity controls the ability to manufacture microstructures via laser-induced direct write

    DOE PAGES

    Tomko, John A.; Olson, David H.; Braun, Jeffrey L.; ...

    2018-01-30

    In controlling the thermal properties of the surrounding environment, we provide insight into the underlying mechanisms driving the widely used laser direct write method for additive manufacturing. In this study, we find that the onset of silver nitrate reduction for the formation of direct write structures directly corresponds to the calculated steady-state temperature rises associated with both continuous wave and high-repetition rate, ultrafast pulsed laser systems. Furthermore, varying the geometry of the heat affected zone, which is controllable based on in-plane thermal diffusion in the substrate, and laser power, allows for control of the written geometries without any prior substratemore » preparation. In conclusion, these findings allow for the advance of rapid manufacturing of micro- and nanoscale structures with minimal material constraints through consideration of the laser-controllable thermal transport in ionic liquid/substrate media.« less

  3. Substrate thermal conductivity controls the ability to manufacture microstructures via laser-induced direct write

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Tomko, John A.; Olson, David H.; Braun, Jeffrey L.

    In controlling the thermal properties of the surrounding environment, we provide insight into the underlying mechanisms driving the widely used laser direct write method for additive manufacturing. In this study, we find that the onset of silver nitrate reduction for the formation of direct write structures directly corresponds to the calculated steady-state temperature rises associated with both continuous wave and high-repetition rate, ultrafast pulsed laser systems. Furthermore, varying the geometry of the heat affected zone, which is controllable based on in-plane thermal diffusion in the substrate, and laser power, allows for control of the written geometries without any prior substratemore » preparation. In conclusion, these findings allow for the advance of rapid manufacturing of micro- and nanoscale structures with minimal material constraints through consideration of the laser-controllable thermal transport in ionic liquid/substrate media.« less

  4. Laser deposition and direct-writing of thermoelectric misfit cobaltite thin films

    NASA Astrophysics Data System (ADS)

    Chen, Jikun; Palla-Papavlu, Alexandra; Li, Yulong; Chen, Lidong; Shi, Xun; Döbeli, Max; Stender, Dieter; Populoh, Sascha; Xie, Wenjie; Weidenkaff, Anke; Schneider, Christof W.; Wokaun, Alexander; Lippert, Thomas

    2014-06-01

    A two-step process combining pulsed laser deposition of calcium cobaltite thin films and a subsequent laser induced forward transfer as micro-pixel is demonstrated as a direct writing approach of micro-scale thin film structures for potential applications in thermoelectric micro-devices. To achieve the desired thermo-electric properties of the cobaltite thin film, the laser induced plasma properties have been characterized utilizing plasma mass spectrometry establishing a direct correlation to the corresponding film composition and structure. The introduction of a platinum sacrificial layer when growing the oxide thin film enables a damage-free laser transfer of calcium cobaltite thereby preserving the film composition and crystallinity as well as the shape integrity of the as-transferred pixels. The demonstrated direct writing approach simplifies the fabrication of micro-devices and provides a large degree of flexibility in designing and fabricating fully functional thermoelectric micro-devices.

  5. Writing and Healing: Toward an Informed Practice. Refiguring English Studies.

    ERIC Educational Resources Information Center

    Anderson, Charles M., Ed.; MacCurdy, Marian M., Ed.

    This book presents 15 essays composed by and directed toward writing teachers and others who have experienced writing and healing in a variety of settings--from classrooms to substance-abuse treatment centers to AIDS support groups. Essays in the book provide not only descriptions of particular practices but also explorations of areas of theory…

  6. Fun While Showing, Not Telling: Crafting Vivid Detail in Writing

    ERIC Educational Resources Information Center

    Del Nero, Jennifer Renner

    2017-01-01

    This teaching tip highlights three writing minilessons that help students construct vivid sensory detail (textual detail related to the five senses) in their fiction and creative nonfiction writing. Learning to show, not tell, is a difficult task for novice writers. The author explores reasons why this is the case and provides directions for the…

  7. Write from the Start: Tapping Your Child's Natural Writing Ability.

    ERIC Educational Resources Information Center

    Graves, Donald; Stuart, Virginia

    Based on a seminal classroom research project directed by Dr. Donald Graves, as well as on the experiences of numerous children, teachers, parents, and researchers around the world, this book shows what can happen when teachers and parents realize that every child can write. Although the book is the result of a collaboration, the two authors have…

  8. Metadiscourse Use in the Persuasive Writing of Malaysian Undergraduate Students

    ERIC Educational Resources Information Center

    Tan, Helen; Eng, Wong Bee

    2014-01-01

    Metadiscourse is a prevalent linguistic resource that helps writers to manage the flow of the propositional contents and to direct their stance towards their contents and readers. Its dominance in persuasive writings has motivated this study which is to examine the occurrences and forms of metadiscourse use in the writing of both the high (HEP)…

  9. Writing Center Work Bridging Boundaries: An Interview with Muriel Harris

    ERIC Educational Resources Information Center

    Threadgill, Elizabeth

    2010-01-01

    This article presents an interview with Dr. Muriel Harris who is considered as one of the most influential figures in writing center research and practice for over three decades. She is currently Professor Emerita of English at Purdue University. She founded The Purdue Writing Center which she directed from 1976 until 2003. She also founded…

  10. Academically Informed Creative Writing in LIS Programs and the Freedom to Be Creative

    ERIC Educational Resources Information Center

    Dali, Keren; Lau, Andrea; Risk, Kevin

    2015-01-01

    This article makes a case for the inclusion of creative writing in Library & Information Science (LIS) courses. Using an example of the course on reading practices and audiences, it shows how creative writing can contribute to the development of creativity, critical thinking, ability for self-direction and independent learning--all the…

  11. A Month in the Life of a Writing Six-Year-Old.

    ERIC Educational Resources Information Center

    Baghban, Marcia

    In order to document the self-directed, spontaneous growth in literary output of a six-year-old child, her writings during a one month period were collected and compiled. It was discovered that the child used writing to organize knowledge about the environment and the operations of print, to maintain personal relations, to establish impersonal or…

  12. Exploring Doctoral Students' Perceptions of Language Use in Supervisory Written Feedback Practices--Because "Feedback Is Hard to Have"

    ERIC Educational Resources Information Center

    Stracke, Elke; Kumar, Vijay

    2016-01-01

    The mastery of academic writing is essential in doctoral writing. Supervisory feedback provides opportunities for students to improve their writing. It is a communicative tool that can be categorised based on fundamental functions of speech: referential, directive, and expressive. This study provides some understanding of the impact that language…

  13. Rethinking the Writing Process: What Best-Selling and Award-Winning Authors Have to Say

    ERIC Educational Resources Information Center

    Sampson, Michael R.; Ortlieb, Evan; Leung, Cynthia B.

    2016-01-01

    Increasing attention has been directed recently to literacy education as a means for disciplinary learning and career readiness. All the while, concepts of print have dramatically changed because the majority of reading and writing now occurs in digital formats. Therefore, it is an ideal time to investigate the complexities of the writing process…

  14. The Effects of Computer-Mediated Synchronous and Asynchronous Direct Corrective Feedback on Writing: A Case Study

    ERIC Educational Resources Information Center

    Shintani, Natsuko

    2016-01-01

    This case study investigated the characteristics of computer-mediated synchronous corrective feedback (SCF, provided while students wrote) and asynchronous corrective feedback (ACF, provided after students had finished writing) in an EFL writing task. The task, designed to elicit the use of the hypothetical conditional, was completed by two…

  15. The Power of Self-Directed Journals: Being a Temporary "Other" for Learning to Teach

    ERIC Educational Resources Information Center

    Matsumoto, Yumi

    2016-01-01

    This case study investigates how an ESL teacher's activity of self-directed journal writing can facilitate learning and function as a mediational tool for teacher professional development. The participant for this study is a native English speaker who taught an ESL freshman writing course in an American university. Since he had little time to…

  16. Direct Write Printing on Thin and Flexible Substrates for Space Applications

    NASA Technical Reports Server (NTRS)

    Paquette, Beth

    2016-01-01

    This presentation describes the work done on direct-write printing conductive traces for a flexible detector application. A Repeatability Plan was established to define detector requirements, material and printer selections, printing facilities, and tests to verify requirements are met. Designs were created for the detector, and printed using an aerosol jet printer. Testing for requirement verification is ongoing.

  17. Korea. Frame In, Frame Out. Writing and Directing Educational Films.

    ERIC Educational Resources Information Center

    Mabrey, Layton

    The techniques of writing and directing an educational film are covered in this book. The book has been written with the intent that it will serve as a guideline for native Koreans interested in producing instructional films for their country. The author begins with a description of the various types of educational films and the uses to which they…

  18. Rethinking a Writing Teacher's Expertise: Following Students under the Kitchen Table

    ERIC Educational Resources Information Center

    Wilson, Maja

    2010-01-01

    In society, expertise bestows directive power--the authority to tell others what to do and how to do it, or simply to do it for them. In a school system that still operates on an authoritarian model, the author's expertise as a writer and teacher gives her directive prerogative when responding to student writing. Traditionally, teachers have used…

  19. Laser direct writing of combinatorial libraries of idealized cellular constructs: Biomedical applications

    NASA Astrophysics Data System (ADS)

    Schiele, Nathan R.; Koppes, Ryan A.; Corr, David T.; Ellison, Karen S.; Thompson, Deanna M.; Ligon, Lee A.; Lippert, Thomas K. M.; Chrisey, Douglas B.

    2009-03-01

    The ability to control cell placement and to produce idealized cellular constructs is essential for understanding and controlling intercellular processes and ultimately for producing engineered tissue replacements. We have utilized a novel intra-cavity variable aperture excimer laser operated at 193 nm to reproducibly direct write mammalian cells with micrometer resolution to form a combinatorial array of idealized cellular constructs. We deposited patterns of human dermal fibroblasts, mouse myoblasts, rat neural stem cells, human breast cancer cells, and bovine pulmonary artery endothelial cells to study aspects of collagen network formation, breast cancer progression, and neural stem cell proliferation, respectively. Mammalian cells were deposited by matrix assisted pulsed laser evaporation direct write from ribbons comprised of a UV transparent quartz coated with either a thin layer of extracellular matrix or triazene as a dynamic release layer using CAD/CAM control. We demonstrate that through optical imaging and incorporation of a machine vision algorithm, specific cells on the ribbon can be laser deposited in spatial coherence with respect to geometrical arrays and existing cells on the receiving substrate. Having the ability to direct write cells into idealized cellular constructs can help to answer many biomedical questions and advance tissue engineering and cancer research.

  20. Factors that determine the optimum dose for sub-20nm resist systems: DUV, EUV, and e-beam options

    NASA Astrophysics Data System (ADS)

    Preil, Moshe

    2012-03-01

    As EUV and e-beam direct write (EBDW) technologies move closer to insertion into pilot production, questions regarding cost effectiveness take on increasing importance. One of the most critical questions is determining the optimum dose which balances the requirements for cost-effective throughput vs. imaging performance. To date most of the dose requirements have been dictated by the hardware side of the industry. The exposure tool manufacturers have a vested interest in specifying the fastest resists possible in order to maximize the throughput even if it comes at the expense of optimum resist performance. This is especially true for both EUV and EBDW where source power is severely limited. We will explore the cost-benefit tradeoffs which drive the equipment side of the industry, and show how these considerations lead to the current throughput and dose requirements for volume production tools. We will then show how the resulting low doses may lead to shot noise problems and a resulting penalty in resist performance. By comparison to the history of 248 nm DUV resist development we will illustrate how setting unrealistic initial targets for resist dose may lead to unacceptable tradeoffs in resist performance and subsequently long delays in the development of production worthy resists.

  1. Heat accumulation regime of femtosecond laser writing in fused silica and Nd:phosphate glass

    NASA Astrophysics Data System (ADS)

    Bukharin, M. A.; Khudyakov, D. V.; Vartapetov, S. K.

    2015-04-01

    We investigated refractive index induced by direct femtosecond laser writing inside fused silica and Nd:phosphate glass in heat accumulation regime. Spatial profile and magnitude of induced refractive index were investigated at various pulse repetition rates and translation velocities. It was shown that the magnitude of induced refractive index significantly rises with decreasing in time interval between successive laser pulses below the time for thermal diffusion. Going from nonthermal regime to heat accumulation regime, we achieved induced refractive index growth from 4 × 10-3 up to 6.5 × 10-3 in fused silica and from -6 × 10-3 to -9 × 10-3 in Nd:phosphate glass. Aspect ratio of treated area decreased from 2.1 down to less than 1.5 without correcting optical elements. It was shown that in heat accumulation regime, the treated area was surrounded by region of alternatively changed refractive index with significant magnitude up to -2 × 10-3. Wide regions of decreased refractive index enable fabrication of depressed cladding waveguides. We demonstrated low-loss (0.3 dB/cm) tubular waveguide inside fused silica. For orthogonal polarizations of guiding light, we achieved a small difference between losses as 0.1 dB/cm using highly symmetric written tracks forming the cladding. The desired structure was simulated with the beam propagation method, and the results were in good agreement with experiment data.

  2. Microbeam complex at TIARA: Technologies to meet a wide range of applications

    NASA Astrophysics Data System (ADS)

    Kamiya, T.; Takano, K.; Satoh, T.; Ishii, Y.; Nishikawa, H.; Seki, S.; Sugimoto, M.; Okumura, S.; Fukuda, M.

    2011-10-01

    Since 1990 R&Ds of microbeam technology has been progressed at the TIARA facility of JAEA Takasaki. In order to meet a wide variety of ion beam applications, analysis, radiation effect studies, or fabrication in regions of micro- or nano-structures, three different types of ion microbeam systems were developed. In these systems, high-spatial resolutions have been achieved and techniques of micro-PIXE, single ion hit and particle beam writing (PBW) were also developed for these applications. Microbeams, on the other hand, require the highest quality of beams from the accelerators, the cyclotron in particular, which was an important part of the microbeam technology of TIARA. In this paper, the latest progress of the ion microbeam technology and applications are summarized and a future prospect of them is discussed.

  3. Brightness measurement of an electron impact gas ion source for proton beam writing applications

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Liu, N.; Santhana Raman, P.; Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117583

    We are developing a high brightness nano-aperture electron impact gas ion source, which can create ion beams from a miniature ionization chamber with relatively small virtual source sizes, typically around 100 nm. A prototype source of this kind was designed and successively micro-fabricated using integrated circuit technology. Experiments to measure source brightness were performed inside a field emission scanning electron microscope. The total output current was measured to be between 200 and 300 pA. The highest estimated reduced brightness was found to be comparable to the injecting focused electron beam reduced brightness. This translates into an ion reduced brightness thatmore » is significantly better than that of conventional radio frequency ion sources, currently used in single-ended MeV accelerators.« less

  4. Brightness measurement of an electron impact gas ion source for proton beam writing applications.

    PubMed

    Liu, N; Xu, X; Pang, R; Raman, P Santhana; Khursheed, A; van Kan, J A

    2016-02-01

    We are developing a high brightness nano-aperture electron impact gas ion source, which can create ion beams from a miniature ionization chamber with relatively small virtual source sizes, typically around 100 nm. A prototype source of this kind was designed and successively micro-fabricated using integrated circuit technology. Experiments to measure source brightness were performed inside a field emission scanning electron microscope. The total output current was measured to be between 200 and 300 pA. The highest estimated reduced brightness was found to be comparable to the injecting focused electron beam reduced brightness. This translates into an ion reduced brightness that is significantly better than that of conventional radio frequency ion sources, currently used in single-ended MeV accelerators.

  5. Tunable pulsed narrow bandwidth light source

    DOEpatents

    Powers, Peter E.; Kulp, Thomas J.

    2002-01-01

    A tunable pulsed narrow bandwidth light source and a method of operating a light source are provided. The light source includes a pump laser, first and second non-linear optical crystals, a tunable filter, and light pulse directing optics. The method includes the steps of operating the pump laser to generate a pulsed pump beam characterized by a nanosecond pulse duration and arranging the light pulse directing optics so as to (i) split the pulsed pump beam into primary and secondary pump beams; (ii) direct the primary pump beam through an input face of the first non-linear optical crystal such that a primary output beam exits from an output face of the first non-linear optical crystal; (iii) direct the primary output beam through the tunable filter to generate a sculpted seed beam; and direct the sculpted seed beam and the secondary pump beam through an input face of the second non-linear optical crystal such that a secondary output beam characterized by at least one spectral bandwidth on the order of about 0.1 cm.sup.-1 and below exits from an output face of the second non-linear optical crystal.

  6. Direct-write maskless lithography using patterned oxidation of Si-substrate Induced by femtosecond laser pulses

    NASA Astrophysics Data System (ADS)

    Kiani, Amirkianoosh; Venkatakrishnan, Krishnan; Tan, Bo

    2013-03-01

    In this study we report a new method for direct-write maskless lithography using oxidized silicon layer induced by high repetition (MHz) ultrafast (femtosecond) laser pulses under ambient condition. The induced thin layer of predetermined pattern can act as an etch stop during etching process in alkaline etchants such as KOH. The proposed method can be leading to promising solutions for direct-write maskless lithography technique since the proposed method offers a higher degree of flexibility and reduced time and cost of fabrication which makes it particularly appropriate for rapid prototyping and custom scale manufacturing. A Scanning Electron Microscope (SEM), Micro-Raman, Energy Dispersive X-ray (EDX), optical microscope and X-ray diffraction spectroscopy (XRD) were used to evaluate the quality of oxidized layer induced by laser pulses.

  7. Laser Direct Write Synthesis of Lead Halide Perovskites

    DOE PAGES

    Chou, Stanley S.; Swartzentruber, Brian S.; Janish, Matthew T.; ...

    2016-09-05

    Lead halide perovskites are increasingly considered for applications beyond photovoltaics, for example, light emission and detection, where an ability to pattern and prototype microscale geometries can facilitate the incorporation of this class of materials into devices. In this study, we demonstrate laser direct write of lead halide perovskites, a remarkably simple procedure that takes advantage of the inverse dependence between perovskite solubility and temperature by using a laser to induce localized heating of an absorbing substrate. We also demonstrate arbitrary pattern formation of crystalline CH 3NH 3PbBr 3 on a range of substrates and fabricate and characterize a microscale photodetectormore » using this approach. This direct write methodology provides a path forward for the prototyping and production of perovskite-based devices.« less

  8. Direct ink write fabrication of transparent ceramic gain media

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Jones, Ivy Krystal; Seeley, Zachary M.; Cherepy, Nerine J.

    Solid-state laser gain media based on the garnet structure with two spatially distinct but optically contiguous regions have been fabricated. Transparent gain media comprised of a central core of Y 2.97Nd 0.03Al 5.00O 12.00 (Nd:YAG) and an undoped cladding region of Y 3Al 5O 12 (YAG) were fabricated by direct ink write and transparent ceramic processing. Direct ink write (DIW) was employed to form the green body, offering a general route to preparing functionally structured solid-state laser gain media. Lastly, fully-dense transparent optical ceramics in a “top hat” geometry with YAG/Nd:YAG have been fabricated by DIW methods with optical scattermore » at 1064 nm of <3%/cm.« less

  9. Laser Direct Write Synthesis of Lead Halide Perovskites

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Chou, Stanley S.; Swartzentruber, Brian S.; Janish, Matthew T.

    Lead halide perovskites are increasingly considered for applications beyond photovoltaics, for example, light emission and detection, where an ability to pattern and prototype microscale geometries can facilitate the incorporation of this class of materials into devices. In this study, we demonstrate laser direct write of lead halide perovskites, a remarkably simple procedure that takes advantage of the inverse dependence between perovskite solubility and temperature by using a laser to induce localized heating of an absorbing substrate. We also demonstrate arbitrary pattern formation of crystalline CH 3NH 3PbBr 3 on a range of substrates and fabricate and characterize a microscale photodetectormore » using this approach. This direct write methodology provides a path forward for the prototyping and production of perovskite-based devices.« less

  10. Direct ink write fabrication of transparent ceramic gain media

    DOE PAGES

    Jones, Ivy Krystal; Seeley, Zachary M.; Cherepy, Nerine J.; ...

    2018-11-06

    Solid-state laser gain media based on the garnet structure with two spatially distinct but optically contiguous regions have been fabricated. Transparent gain media comprised of a central core of Y 2.97Nd 0.03Al 5.00O 12.00 (Nd:YAG) and an undoped cladding region of Y 3Al 5O 12 (YAG) were fabricated by direct ink write and transparent ceramic processing. Direct ink write (DIW) was employed to form the green body, offering a general route to preparing functionally structured solid-state laser gain media. Lastly, fully-dense transparent optical ceramics in a “top hat” geometry with YAG/Nd:YAG have been fabricated by DIW methods with optical scattermore » at 1064 nm of <3%/cm.« less

  11. Direct writing of flexible electronics through room temperature liquid metal ink.

    PubMed

    Gao, Yunxia; Li, Haiyan; Liu, Jing

    2012-01-01

    Conventional approaches of making a flexible circuit are generally complex, environment unfriendly, time and energy consuming, and thus expensive. Here, we describe for the first time the method of using high-performance GaIn(10)-based electrical ink, a significantly neglected room temperature liquid metal, as both electrical conductors and interconnects, for directly writing flexible electronics via a rather easy going and cost effective way. The new generation electric ink was made and its wettability with various materials was modified to be easily written on a group of either soft or rigid substrates such as epoxy resin board, glass, plastic, silica gel, paper, cotton, textiles, cloth and fiber etc. Conceptual experiments were performed to demonstrate and evaluate the capability of directly writing the electrical circuits via the invented metal ink. Mechanisms involved were interpreted through a series of fundamental measurements. The electrical resistivity of the fluid like GaIn(10)-based material was measured as 34.5 µΩ·cm at 297 K by four point probe method and increased with addition of the oxygen quantity, which indicates it as an excellent metal ink. The conductive line can be written with features that are approximately 10 µm thick. Several functional devices such as a light emitting diode (LED) array showing designed lighting patterns and electrical fan were made to work by directly writing the liquid metal on the specific flexible substrates. And satisfactory performances were obtained. The present method opens the way to directly and quickly writing flexible electronics which can be as simple as signing a name or drawing a picture on the paper. The unique merit of the GaIn(10)-based liquid metal ink lies in its low melting temperature, well controlled wettability, high electrical conductivity and good biocompability. The new electronics writing strategy and basic principle has generalized purpose and can be extended to more industrial areas, even daily life.

  12. Direct Writing of Flexible Electronics through Room Temperature Liquid Metal Ink

    PubMed Central

    Gao, Yunxia; Li, Haiyan; Liu, Jing

    2012-01-01

    Background Conventional approaches of making a flexible circuit are generally complex, environment unfriendly, time and energy consuming, and thus expensive. Here, we describe for the first time the method of using high-performance GaIn10-based electrical ink, a significantly neglected room temperature liquid metal, as both electrical conductors and interconnects, for directly writing flexible electronics via a rather easy going and cost effective way. Methods The new generation electric ink was made and its wettability with various materials was modified to be easily written on a group of either soft or rigid substrates such as epoxy resin board, glass, plastic, silica gel, paper, cotton, textiles, cloth and fiber etc. Conceptual experiments were performed to demonstrate and evaluate the capability of directly writing the electrical circuits via the invented metal ink. Mechanisms involved were interpreted through a series of fundamental measurements. Results The electrical resistivity of the fluid like GaIn10-based material was measured as 34.5 µΩ·cm at 297 K by four point probe method and increased with addition of the oxygen quantity, which indicates it as an excellent metal ink. The conductive line can be written with features that are approximately 10 µm thick. Several functional devices such as a light emitting diode (LED) array showing designed lighting patterns and electrical fan were made to work by directly writing the liquid metal on the specific flexible substrates. And satisfactory performances were obtained. Conclusions The present method opens the way to directly and quickly writing flexible electronics which can be as simple as signing a name or drawing a picture on the paper. The unique merit of the GaIn10-based liquid metal ink lies in its low melting temperature, well controlled wettability, high electrical conductivity and good biocompability. The new electronics writing strategy and basic principle has generalized purpose and can be extended to more industrial areas, even daily life. PMID:23029044

  13. Maskless writing of a flexible nanoscale transistor with Au-contacted carbon nanotube electrodes

    NASA Astrophysics Data System (ADS)

    Dockendorf, Cedric P. R.; Poulikakos, Dimos; Hwang, Gilgueng; Nelson, Bradley J.; Grigoropoulos, Costas P.

    2007-12-01

    A flexible polymer field effect transistor with a nanoscale carbon nanotube channel is conceptualized and realized herein. Carbon nanotubes (CNTs) were dispersed on a polyimide substrate and marked in an scanning electron microscope with focused ion beam such that they could be contacted with gold nanoink. The CNTs were divided into two parts forming the source and drain of the transistor. A micropipette writing method was used to contact the carbon nanotube electrodes with gold nanoink and to deposit the poly(3-hexylthiophene) as an active layer. The mobility of the transistors is of the order of 10-5cm/Vs. After fabrication, the flexible transistors can be peeled off the substrate.

  14. Characterization of linear accelerator X-ray source size using a laminated beam-spot camera.

    PubMed

    Yeboah, Collins

    2011-05-10

    A laminated beam-spot camera of length 20 cm and effective cross-sectional area 2.5 cm × 3 cm was designed and constructed for the measurement of X-ray beam-spot sizes on different models of Siemens accelerators. With the accelerator gantry at 180° and camera positioned on an accessory tray holder, an XV film placed in contact with the camera at the distal end of it detected those X-rays that were transmitted through the camera. The FWHM of the detected X-ray intensity profile in the gun-target (G-T) direction or the orthogonal A-B direction was used as a measure of the beam-spot size in that direction. Siemens Mevatron MXEs exhibited a beam-spot size of 1.7 ± 0.2 mm in both the in-plane and cross-plane directions for 6 MV photon beams. The beam-spot size observed for a Mevatron MDX-2 was larger by up to 1 mm, and also was different for the in-plane and cross-plane directions. For Siemens PRIMUS accelerators, the beam-spot size in the in-plane direction was found to fall in the range 2.0-2.2 ± 0.2 mm, whereas the beam-spot size in the cross-plane direction fell within 1.7-1.9 ± 0.2 mm for 6, 10, and 18 MV photon beams. Assessment of long-term stability of the beam-spot size shows the spot size remains fairly stable over time.

  15. Maskless laser writing of microscopic metallic interconnects

    DOEpatents

    Maya, L.

    1995-10-17

    A method of forming a metal pattern on a substrate is disclosed. The method includes depositing an insulative nitride film on a substrate and irradiating a laser beam onto the nitride film, thus decomposing the metal nitride into a metal constituent and a gaseous constituent, the metal constituent remaining in the nitride film as a conductive pattern. 4 figs.

  16. Enhanced laser beam coupling to a plasma

    DOEpatents

    Steiger, Arno D.; Woods, Cornelius H.

    1976-01-01

    Density perturbations are induced in a heated plasma by means of a pair of oppositely directed, polarized laser beams of the same frequency. The wavelength of the density perturbations is equal to one half the wavelength of the laser beams. A third laser beam is linearly polarized and directed at the perturbed plasma along a line that is perpendicular to the direction of the two opposed beams. The electric field of the third beam is oriented to lie in the plane containing the three beams. The frequency of the third beam is chosen to cause it to interact resonantly with the plasma density perturbations, thereby efficiently coupling the energy of the third beam to the plasma.

  17. Frequency shift measurement in shock-compressed materials

    DOEpatents

    Moore, David S.; Schmidt, Stephen C.

    1985-01-01

    A method for determining molecular vibrational frequencies in shock-compressed transparent materials. A single laser beam pulse is directed into a sample material while the material is shock-compressed from a direction opposite that of the incident laser beam. A Stokes beam produced by stimulated Raman scattering is emitted back along the path of the incident laser beam, that is, in the opposite direction to that of the incident laser beam. The Stokes beam is separated from the incident beam and its frequency measured. The difference in frequency between the Stokes beam and the incident beam is representative of the characteristic frequency of the Raman active mode of the sample. Both the incident beam and the Stokes beam pass perpendicularly through the shock front advancing through the sample, thereby minimizing adverse effects of refraction.

  18. Frequency shift measurement in shock-compressed materials

    DOEpatents

    Moore, D.S.; Schmidt, S.C.

    1984-02-21

    A method is disclosed for determining molecular vibrational frequencies in shock-compressed transparent materials. A single laser beam pulse is directed into a sample material while the material is shock-compressed from a direction opposite that of the incident laser beam. A Stokes beam produced by stimulated Raman scattering is emitted back along the path of the incident laser beam, that is, in the opposite direction to that of the incident laser beam. The Stokes beam is separated from the incident beam and its frequency measured. The difference in frequency between the Stokes beam and the incident beam is representative of the characteristic frequency of the Raman active mode of the sample. Both the incident beam and the Stokes beam pass perpendicularly through the stock front advancing through the sample, thereby minimizing adverse effects of refraction.

  19. Applications of ultrafast laser direct writing: from polarization control to data storage

    NASA Astrophysics Data System (ADS)

    Donko, A.; Gertus, T.; Brambilla, G.; Beresna, M.

    2018-02-01

    Ultrafast laser direct writing is a fascinating technology which emerged more than two decades from fundamental studies of material resistance to high-intensity optical fields. Its development saw the discovery of many puzzling phenomena and demonstration of useful applications. Today, ultrafast laser writing is seen as a technology with great potential and is rapidly entering the industrial environment. Whereas, less than 10 years ago, ultrafast lasers were still confined within the research labs. This talk will overview some of the unique features of ultrafast lasers and give examples of its applications in optical data storage, polarization control and optical fibers.

  20. Grayscale photomask fabricated by laser direct writing in metallic nano-films.

    PubMed

    Guo, Chuan Fei; Cao, Sihai; Jiang, Peng; Fang, Ying; Zhang, Jianming; Fan, Yongtao; Wang, Yongsheng; Xu, Wendong; Zhao, Zhensheng; Liu, Qian

    2009-10-26

    The grayscale photomask plays a key role in grayscale lithography for creating 3D microstructures like micro-optical elements and MEMS structures, but how to fabricate grayscale masks in a cost-effective way is still a big challenge. Here we present novel low cost grayscale masks created in a two-step method by laser direct writing on Sn nano-films, which demonstrate continuous-tone gray levels depended on writing powers. The mechanism of the gray levels is due to the coexistence of the metal and the oxides formed in a laser-induced thermal process. The photomasks reveal good technical properties in fabricating 3D microstructures for practical applications.

  1. Direct writing of 150 nm gratings and squares on ZnO crystal in water by using 800 nm femtosecond laser.

    PubMed

    Liu, Jukun; Jia, Tianqing; Zhou, Kan; Feng, Donghai; Zhang, Shian; Zhang, Hongxin; Jia, Xin; Sun, Zhenrong; Qiu, Jianrong

    2014-12-29

    We present a controllable fabrication of nanogratings and nanosquares on the surface of ZnO crystal in water based on femtosecond laser-induced periodic surface structures (LIPSS). The formation of nanogrooves depends on both laser fluence and writing speed. A single groove with width less than 40 nm and double grooves with distance of 150 nm have been produced by manipulating 800 nm femtosecond laser fluence. Nanogratings with period of 150 nm, 300 nm and 1000 nm, and nanosquares with dimensions of 150 × 150 nm2 were fabricated by using this direct femtosecond laser writing technique.

  2. Respectful Alignment of Programs as a Possible Factor in Remedial Writers' Pass Rates

    ERIC Educational Resources Information Center

    McDonald, Mary

    2017-01-01

    For over four years, students enrolled in remedial writing classes who attended eight writing center tutorials directly linked to their assignments had an average pass rate of 95.6 percent, whereas students who did not attend any writing center tutorials had an average pass rate of 39.4 percent. These correlations are just that--correlations that…

  3. The Role of Written Corrective Feedback in Enhancing the Linguistic Accuracy of Iranian Japanese Learners' Writing

    ERIC Educational Resources Information Center

    Shirazi, Masoumeh Ahmadi; Shekarabi, Zeinab

    2014-01-01

    This study is an attempt to investigate the effect of direct and indirect feedback on the writing performance of Iranian learners of Japanese as a foreign language. During one academic semester, three indirect feedback types including underlining, coding and translation were used as well as direct type of feedback in order to see which one makes a…

  4. Mirror man: a case of skilled deliberate mirror writing.

    PubMed

    McIntosh, Robert D; De Lucia, Natascia; Della Sala, Sergio

    2014-01-01

    Mirror writing is a striking behaviour that is common in children and can reemerge in adults following brain damage. Skilled deliberate mirror writing has also been reported, but only anecdotally. We provide the first quantitative study of skilled deliberate mirror writing. K.B. can write forward or backward, vertically upright or inverted, with the hands acting alone or simultaneously. K.B. is predominantly left handed, but writes habitually with his right hand. Of his writing formats, his left hand mirror writing is by far the most similar in style to his normal handwriting. When writing bimanually, he performs better when his two hands make mirror-symmetrical movements to write opposite scripts than if they move in the same direction to write similar scripts. He has no special facility for reading mirrored text. These features are consistent with prior anecdotal cases and support a motor basis for K.B.'s ability, according to which his skilled mirror writing results from the left hand execution of a low-level motor program for a right hand abductive writing action. Our methods offer a novel framework for investigating the sharing of motor representations across effectors.

  5. Exploring the Amount and Type of Writing Instruction during Language Arts Instruction in Kindergarten Classrooms

    PubMed Central

    Puranik, Cynthia S.; Al Otaiba, Stephanie; Sidler, Jessica Folsom; Greulich, Luana

    2014-01-01

    The objective of this exploratory investigation was to examine the nature of writing instruction in kindergarten classrooms and to describe student writing outcomes at the end of the school year. Participants for this study included 21 teachers and 238 kindergarten children from nine schools. Classroom teachers were videotaped once each in the fall and winter during the 90 minute instructional block for reading and language arts to examine time allocation and the types of writing instructional practices taking place in the kindergarten classrooms. Classroom observation of writing was divided into student-practice variables (activities in which students were observed practicing writing or writing independently) and teacher-instruction variables (activities in which the teacher was observed providing direct writing instruction). In addition, participants completed handwriting fluency, spelling, and writing tasks. Large variability was observed in the amount of writing instruction occurring in the classroom, the amount of time kindergarten teachers spent on writing and in the amount of time students spent writing. Marked variability was also observed in classroom practices both within and across schools and this fact was reflected in the large variability noted in kindergartners’ writing performance. PMID:24578591

  6. Exploring the Amount and Type of Writing Instruction during Language Arts Instruction in Kindergarten Classrooms.

    PubMed

    Puranik, Cynthia S; Al Otaiba, Stephanie; Sidler, Jessica Folsom; Greulich, Luana

    2014-02-01

    The objective of this exploratory investigation was to examine the nature of writing instruction in kindergarten classrooms and to describe student writing outcomes at the end of the school year. Participants for this study included 21 teachers and 238 kindergarten children from nine schools. Classroom teachers were videotaped once each in the fall and winter during the 90 minute instructional block for reading and language arts to examine time allocation and the types of writing instructional practices taking place in the kindergarten classrooms. Classroom observation of writing was divided into student-practice variables (activities in which students were observed practicing writing or writing independently) and teacher-instruction variables (activities in which the teacher was observed providing direct writing instruction). In addition, participants completed handwriting fluency, spelling, and writing tasks. Large variability was observed in the amount of writing instruction occurring in the classroom, the amount of time kindergarten teachers spent on writing and in the amount of time students spent writing. Marked variability was also observed in classroom practices both within and across schools and this fact was reflected in the large variability noted in kindergartners' writing performance.

  7. Direct measurements on imaging riometer antenna array beam directivities

    NASA Astrophysics Data System (ADS)

    Wilson, A.; Nel, J. J.; Mathews, M. J.; Stoker, P. H.

    2001-01-01

    Spatial structures in enhanced ionization of the ionosphere are observed by absorption of cosmic radio waves. These structures are resolved by using theoretically derived imaging riometer antenna array directivities. These directivities are calculated from beam phasing of 64 crossed dipole elements of the 38.2-MHz antenna array at SANAE IV, Antarctica. In order to ensure that these derived directivities are representative of the actual viewing directions of the 64-beams, a radio transmitter was flown by helicopter across the antenna array. In this paper variations in the receiver signal strengths, recorded when flying across beam-viewing directions, are compared with the spatial and angular-dependent profiles of expected receiver output responses, derived theoretically from the directivities of the antenna array. A Global Positioning System (GPS) device on board the helicopter was used for positional recording. The derived and recorded profiles did coincide occasionally, but at other instances relative displacements and differences in magnitude of responses were observed. These displacements and differences could be attributed to degradation in position fixes imposed deliberately by selective availability on the GPS system. Excellent coincidence for a number of beam crossings proved that the viewing directions are accurate in all the beam directions, since the multi-dimensional Butler matrix produces 64 simultaneous beams.

  8. Use of beam deflection to control an electron beam wire deposition process

    NASA Technical Reports Server (NTRS)

    Taminger, Karen M. (Inventor); Hofmeister, William H. (Inventor); Hafley, Robert A. (Inventor)

    2013-01-01

    A method for controlling an electron beam process wherein a wire is melted and deposited on a substrate as a molten pool comprises generating the electron beam with a complex raster pattern, and directing the beam onto an outer surface of the wire to thereby control a location of the wire with respect to the molten pool. Directing the beam selectively heats the outer surface of the wire and maintains the position of the wire with respect to the molten pool. An apparatus for controlling an electron beam process includes a beam gun adapted for generating the electron beam, and a controller adapted for providing the electron beam with a complex raster pattern and for directing the electron beam onto an outer surface of the wire to control a location of the wire with respect to the molten pool.

  9. Focused electron beam induced deposition: A perspective

    PubMed Central

    Porrati, Fabrizio; Schwalb, Christian; Winhold, Marcel; Sachser, Roland; Dukic, Maja; Adams, Jonathan; Fantner, Georg

    2012-01-01

    Summary Background: Focused electron beam induced deposition (FEBID) is a direct-writing technique with nanometer resolution, which has received strongly increasing attention within the last decade. In FEBID a precursor previously adsorbed on a substrate surface is dissociated in the focus of an electron beam. After 20 years of continuous development FEBID has reached a stage at which this technique is now particularly attractive for several areas in both, basic and applied research. The present topical review addresses selected examples that highlight this development in the areas of charge-transport regimes in nanogranular metals close to an insulator-to-metal transition, the use of these materials for strain- and magnetic-field sensing, and the prospect of extending FEBID to multicomponent systems, such as binary alloys and intermetallic compounds with cooperative ground states. Results: After a brief introduction to the technique, recent work concerning FEBID of Pt–Si alloys and (hard-magnetic) Co–Pt intermetallic compounds on the nanometer scale is reviewed. The growth process in the presence of two precursors, whose flux is independently controlled, is analyzed within a continuum model of FEBID that employs rate equations. Predictions are made for the tunability of the composition of the Co–Pt system by simply changing the dwell time of the electron beam during the writing process. The charge-transport regimes of nanogranular metals are reviewed next with a focus on recent theoretical advancements in the field. As a case study the transport properties of Pt–C nanogranular FEBID structures are discussed. It is shown that by means of a post-growth electron-irradiation treatment the electronic intergrain-coupling strength can be continuously tuned over a wide range. This provides unique access to the transport properties of this material close to the insulator-to-metal transition. In the last part of the review, recent developments in mechanical strain-sensing and the detection of small, inhomogeneous magnetic fields by employing nanogranular FEBID structures are highlighted. Conclusion: FEBID has now reached a state of maturity that allows a shift of the focus towards the development of new application fields, be it in basic research or applied. This is shown for selected examples in the present review. At the same time, when seen from a broader perspective, FEBID still has to live up to the original idea of providing a tool for electron-controlled chemistry on the nanometer scale. This has to be understood in the sense that, by providing a suitable environment during the FEBID process, the outcome of the electron-induced reactions can be steered in a controlled way towards yielding the desired composition of the products. The development of a FEBID-specialized surface chemistry is mostly still in its infancy. Next to application development, it is this aspect that will likely be a guiding light for the future development of the field of focused electron beam induced deposition. PMID:23019557

  10. Chapter 1: Direct Normal Radiation

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Myer, Daryl R.

    2016-04-15

    This chapter addresses the quantitative and qualitative aspects of the solar resource, the direct solar radiation. It discusses the total or integrated broadband direct beam extraterrestrial radiation (ETR). This total integrated irradiance is comprised of photons of electromagnetic radiation. The chapter also discusses the impact of the atmosphere and its effect upon the direct normal irradiance (DNI) beam radiation. The gases and particulates present in the atmosphere traversed by the direct beam reflect, absorb, and scatter differing spectral regions and proportions of the direct beam, and act as a variable filter. Knowledge of the available broadband DNI beam radiation resourcemore » data is essential in designing a concentrating photovoltaic (CPV) system. Spectral variations in the DNI beam radiation affect the performance of a CPV system depending on the solar cell technology used. The chapter describes propagation and scattering processes of circumsolar radiation (CSR), which includes the Mie scattering from large particles.« less

  11. Direct-Write 3D Nanoprinting of Plasmonic Structures

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Winkler, Robert; Schmidt, Franz-Philipp; Karl-Franzens Univ.

    During the past decade, significant progress has been made in the field of resonant optics ranging from fundamental aspects to concrete applications. And while several techniques have been introduced for the fabrication of highly defined metallic nanostructures, the synthesis of complex, free-standing three-dimensional (3D) structures is still an intriguing, but so far intractable, challenge. Here, we demonstrate a 3D direct-write synthesis approach that addresses this challenge. Specifically, we succeeded in the direct-write fabrication of 3D nanoarchitectures via electron-stimulated reactions, which are applicable on virtually any material and surface morphology. Furthermore, by that, complex 3D nanostructures composed of highly compact, puremore » gold can be fabricated, which reveal strong plasmonic activity and pave the way for a new generation of 3D nanoplasmonic architectures that can be printed on-demand.« less

  12. Direct-Write 3D Nanoprinting of Plasmonic Structures

    DOE PAGES

    Winkler, Robert; Schmidt, Franz-Philipp; Karl-Franzens Univ.; ...

    2016-11-23

    During the past decade, significant progress has been made in the field of resonant optics ranging from fundamental aspects to concrete applications. And while several techniques have been introduced for the fabrication of highly defined metallic nanostructures, the synthesis of complex, free-standing three-dimensional (3D) structures is still an intriguing, but so far intractable, challenge. Here, we demonstrate a 3D direct-write synthesis approach that addresses this challenge. Specifically, we succeeded in the direct-write fabrication of 3D nanoarchitectures via electron-stimulated reactions, which are applicable on virtually any material and surface morphology. Furthermore, by that, complex 3D nanostructures composed of highly compact, puremore » gold can be fabricated, which reveal strong plasmonic activity and pave the way for a new generation of 3D nanoplasmonic architectures that can be printed on-demand.« less

  13. Manufacturing an advanced process characterization reticle incorporating halftone biasing

    NASA Astrophysics Data System (ADS)

    Nakagawa, Kent H.; Van Den Broeke, Douglas J.; Chen, J. Fung; Laidig, Thomas L.; Wampler, Kurt E.; Caldwell, Roger F.

    1999-04-01

    As the semiconductor roadmap continues to require imaging of smaller feature son wafers, we continue to explore new approaches in OPC strategies to extend the lifespan of existing technology. In this paper, we study a new OPC technology, called halftone biasing, and its application on an OPC characterization reticle, designed by MicroUnity Systems Engineering, Inc. The RTP9 test reticle is the latest in a series of 'LineSweeper' characterization reticles. Each reticle contains a wide range of line width sand pitches, each with several alternative OPC treatments, including references cases, scattering bars, and fine biasing. One of RTP9's design requirements was to support very fine, incremental biases for densely-pitched lines. Ordinarily, this would dictate a reduced address unit and with it the costly penalty of a square-law increase in e- beam write time. RTP9 incorporates a new OPC strategy, called halftone biasing, which has been proposed to address this problem. Taking advantage of optical reduction printing, this technique applies a sub-resolution halftone screen to the edges of figures to accomplish fine biasing equivalent to using an address unit one-fourth of the size of the actual e-beam writing grid. The resulting edge structure has some of the characteristics of aggressive OPC structures, but can be used in areas where traditional scattering bars cannot be placed. The trade-off between the faster write times achieved and the inflation of pattern file size is examined. The manufacturability and inspectability of halftone-biased lines on the RTP9 test reticle are explored. Pattern fidelity is examined using both optical and SEM tools. Printed 0.18 micrometers DUV resist line edge profiles are compared for both halftone and non- halftone feature edges. The CD uniformity of the OPC features, and result of die-to-database inspection are reported. The application of halftone biasing to real circuits, including the impact of data volume and saved write time, is also discussed.

  14. Klystron having electrostatic quadrupole focusing arrangement

    DOEpatents

    Maschke, Alfred W.

    1983-08-30

    A klystron includes a source for emitting at least one electron beam, and an accelerator for accelarating the beam in a given direction through a number of drift tube sections successively aligned relative to one another in the direction of the beam. A number of electrostatic quadrupole arrays are successively aligned relative to one another along at least one of the drift tube sections in the beam direction for focusing the electron beam. Each of the electrostatic quadrupole arrays forms a different quadrupole for each electron beam. Two or more electron beams can be maintained in parallel relationship by the quadrupole arrays, thereby enabling space charge limitations encountered with conventional single beam klystrons to be overcome.

  15. Klystron having electrostatic quadrupole focusing arrangement

    DOEpatents

    Maschke, A.W.

    1983-08-30

    A klystron includes a source for emitting at least one electron beam, and an accelerator for accelerating the beam in a given direction through a number of drift tube sections successively aligned relative to one another in the direction of the beam. A number of electrostatic quadrupole arrays are successively aligned relative to one another along at least one of the drift tube sections in the beam direction for focusing the electron beam. Each of the electrostatic quadrupole arrays forms a different quadrupole for each electron beam. Two or more electron beams can be maintained in parallel relationship by the quadrupole arrays, thereby enabling space charge limitations encountered with conventional single beam klystrons to be overcome. 4 figs.

  16. Method and apparatus for bistable optical information storage for erasable optical disks

    DOEpatents

    Land, Cecil E.; McKinney, Ira D.

    1990-01-01

    A method and an optical device for bistable storage of optical information, together with reading and erasure of the optical information, using a photoactivated shift in a field dependent phase transition between a metastable or a bias-stabilized ferroelectric (FE) phase and a stable antiferroelectric (AFE) phase in an lead lanthanum zirconate titanate (PLZT). An optical disk contains the PLZT. Writing and erasing of optical information can be accomplished by a light beam normal to the disk. Reading of optical information can be accomplished by a light beam at an incidence angle of 15 to 60 degrees to the normal of the disk.

  17. Method and apparatus for bistable optical information storage for erasable optical disks

    DOEpatents

    Land, C.E.; McKinney, I.D.

    1988-05-31

    A method and an optical device for bistable storage of optical information, together with reading and erasure of the optical information, using a photoactivated shift in a field dependent phase transition between a metastable or a bias-stabilized ferroelectric (FE) phase and a stable antiferroelectric (AFE) phase in a lead lanthanum zirconate titanate (PLZT). An optical disk contains the PLZT. Writing and erasing of optical information can be accomplished by a light beam normal to the disk. Reading of optical information can be accomplished by a light beam at an incidence angle of 15 to 60 degrees to the normal of the disk. 10 figs.

  18. First Results From A Multi-Ion Beam Lithography And Processing System At The University Of Florida

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Gila, Brent; Appleton, Bill R.; Fridmann, Joel

    2011-06-01

    The University of Florida (UF) have collaborated with Raith to develop a version of the Raith ionLiNE IBL system that has the capability to deliver multi-ion species in addition to the Ga ions normally available. The UF system is currently equipped with a AuSi liquid metal alloy ion source (LMAIS) and ExB filter making it capable of delivering Au and Si ions and ion clusters for ion beam processing. Other LMAIS systems could be developed in the future to deliver other ion species. This system is capable of high performance ion beam lithography, sputter profiling, maskless ion implantation, ion beammore » mixing, and spatial and temporal ion beam assisted writing and processing over large areas (100 mm2)--all with selected ion species at voltages from 15-40 kV and nanometer precision. We discuss the performance of the system with the AuSi LMAIS source and ExB mass separator. We report on initial results from the basic system characterization, ion beam lithography, as well as for basic ion-solid interactions.« less

  19. Making Sense of "The Boy Who Died": Tales of a Struggling Successful Writer

    ERIC Educational Resources Information Center

    Dutro, Elizabeth; Kazemi, Elham; Balf, Ruth

    2006-01-01

    This article presents a case study of a fourth grade boy's experiences in writing, preceding and following a story he wrote about a boy whose struggles in writing led directly to his death. We explore how Max's writing experiences related to his identity, specifically his sense of himself as a writer, his struggle to communicate his ideas, and his…

  20. Experiential self-focus writing as a facilitator of processing an interpersonal hurt.

    PubMed

    Liao, Kelly Yu-Hsin; Wei, Meifen; Russell, Daniel W; Abraham, W Todd

    2012-10-01

    This study examined the effects of experiential self-focus writing on changes in psychological outcomes (i.e., unforgiveness and negative affect) after an interpersonal hurt and the buffering effects of experiential self-focus writing on the association between anger rumination and these psychological outcomes. A sample of 182 college students who had experienced interpersonal hurt were randomly assigned to either the experiential self-focus writing condition, in which participants wrote about their feelings and experiences related to the hurt, or to a control writing condition in which they wrote about a recent neutral event. Latent growth curve analyses indicated that changes in unforgiveness over time did not differ between the experiential self-focus writing and the control writing conditions. However, relative to the control writing condition, negative affect decreased faster during writing and increased more slowly at follow-ups in the experiential self-focus writing condition. The results supported the hypothesis that negative affect resulting from an interpersonal hurt would significantly decrease over time among participants in the experiential self-focus writing group compared with the control group. Implications of experiential self-focus writing for interpersonal hurt and directions for future studies are discussed. © 2012 Wiley Periodicals, Inc.

  1. Precision Rolled-Ink Nano-Technology; Development of a Direct Write Technique for the Fabrication of Thin Films and Conductive Elements

    DTIC Science & Technology

    2012-10-01

    Fabrication of Thin Films and Conductive Elements Larry R. Holmes, Jr. Weapons and Materials Research Directorate, ARL...polymer composites, glass, metals, ceramics , and others. Development of the PRINT system and future work are discussed. 15. SUBJECT TERMS direct write...7 Figure 5. PRINT deposition on (left) polished aluminum sheet metal, and (right) aluminum oxide ceramic tile

  2. Gelatin-based laser direct-write technique for the precise spatial patterning of cells.

    PubMed

    Schiele, Nathan R; Chrisey, Douglas B; Corr, David T

    2011-03-01

    Laser direct-writing provides a method to pattern living cells in vitro, to study various cell-cell interactions, and to build cellular constructs. However, the materials typically used may limit its long-term application. By utilizing gelatin coatings on the print ribbon and growth surface, we developed a new approach for laser cell printing that overcomes the limitations of Matrigel™. Gelatin is free of growth factors and extraneous matrix components that may interfere with cellular processes under investigation. Gelatin-based laser direct-write was able to successfully pattern human dermal fibroblasts with high post-transfer viability (91% ± 3%) and no observed double-strand DNA damage. As seen with atomic force microscopy, gelatin offers a unique benefit in that it is present temporarily to allow cell transfer, but melts and is removed with incubation to reveal the desired application-specific growth surface. This provides unobstructed cellular growth after printing. Monitoring cell location after transfer, we show that melting and removal of gelatin does not affect cellular placement; cells maintained registry within 5.6 ± 2.5 μm to the initial pattern. This study demonstrates the effectiveness of gelatin in laser direct-writing to create spatially precise cell patterns with the potential for applications in tissue engineering, stem cell, and cancer research.

  3. Suppressing four-wave mixing in warm-atomic-vapor quantum memory

    NASA Astrophysics Data System (ADS)

    Vurgaftman, Igor; Bashkansky, Mark

    2013-06-01

    Warm-atomic-vapor cells may be employed as quantum-memory components in an experimentally convenient implementation of the Duan-Lukin-Cirac-Zoller protocol. Previous studies have shown the performance of these cells is limited by the combination of collisional fluorescence during the writing process and four-wave mixing during the reading process and have proposed to overcome this by a combination of optimized detuning and prepumping with circularly polarized write and read beams. Here we show that the Raman matrix elements involving the excited P (F'=I-(1)/(2) and F'=I+(1)/(2)) levels of all alkali atoms are always equal in magnitude and opposite in sign when the write and the anti-Stokes (Stokes) photons have the opposite helicity, and the Raman transitions via the two levels interfere destructively. The existence of an optimal detuning is demonstrated for a given dark-count rate of the single-photon detector. The predicted behavior is observed experimentally in a warm Rb cell with buffer gas.

  4. Ultra-high aspect ratio replaceable AFM tips using deformation-suppressed focused ion beam milling.

    PubMed

    Savenko, Alexey; Yildiz, Izzet; Petersen, Dirch Hjorth; Bøggild, Peter; Bartenwerfer, Malte; Krohs, Florian; Oliva, Maria; Harzendorf, Torsten

    2013-11-22

    Fabrication of ultra-high aspect ratio exchangeable and customizable tips for atomic force microscopy (AFM) using lateral focused ion beam (FIB) milling is presented. While on-axis FIB milling does allow high aspect ratio (HAR) AFM tips to be defined, lateral milling gives far better flexibility in terms of defining the shape and size of the tip. Due to beam-induced deformation, it has so far not been possible to define HAR structures using lateral FIB milling. In this work we obtain aspect ratios of up to 45, with tip diameters down to 9 nm, by a deformation-suppressing writing strategy. Several FIB milling strategies for obtaining sharper tips are discussed. Finally, assembly of the HAR tips on a custom-designed probe as well as the first AFM scanning is shown.

  5. Editorial

    NASA Astrophysics Data System (ADS)

    Xiao, Guoqing; Shen, Hao; Du, Guanghua

    2017-08-01

    This special issue of Nuclear Instruments and Methods B contains the proceedings of the 15th International Conference on Nuclear Microprobe Technology and Applications (ICNMTA2016) and the 6th International Workshop on Proton Beam Writing held in Lanzhou, China, from 31 July to 5 August 2016. The conference was hosted by the Institute of Modern Physics, Chinese Academy of Sciences and was co-organized by Fudan University.

  6. Infrared tracker for a portable missile launcher

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Carlson, J.J.

    1993-07-13

    An infrared beam tracker is described for arrangement to a housing that is unitary with a portable missile launcher, comprising: a rotating beam splitter positioned to intercept the infrared beam passing a first portion of the beam through the beam splitter along a first direction and reflecting the remaining portion along a different direction; a first infrared detector for receiving the beam reflected portion from the beam splitter and produce electric signals responsive thereto; a second infrared detector for receiving the beam portion that passes through the beam splitter and providing electric signals responsive thereto; and means interconnected to themore » first and second infrared detectors and responsive to the electric signals generated by said detectors for determining errors in missile flight direction and communicating course correction information to the missile.« less

  7. Performance testing and results of the first Etec CORE-2564

    NASA Astrophysics Data System (ADS)

    Franks, C. Edward; Shikata, Asao; Baker, Catherine A.

    1993-03-01

    In order to be able to write 64 megabit DRAM reticles, to prepare to write 256 megabit DRAM reticles and in general to meet the current and next generation mask and reticle quality requirements, Hoya Micro Mask (HMM) installed in 1991 the first CORE-2564 Laser Reticle Writer from Etec Systems, Inc. The system was delivered as a CORE-2500XP and was subsequently upgraded to a 2564. The CORE (Custom Optical Reticle Engraver) system produces photomasks with an exposure strategy similar to that employed by an electron beam system, but it uses a laser beam to deliver the photoresist exposure energy. Since then the 2564 has been tested by Etec's standard Acceptance Test Procedure and by several supplementary HMM techniques to insure performance to all the Etec advertised specifications and certain additional HMM requirements that were more demanding and/or more thorough than the advertised specifications. The primary purpose of the HMM tests was to more closely duplicate mask usage. The performance aspects covered by the tests include registration accuracy and repeatability; linewidth accuracy, uniformity and linearity; stripe butting; stripe and scan linearity; edge quality; system cleanliness; minimum geometry resolution; minimum address size and plate loading accuracy and repeatability.

  8. Additive manufacturing with polypropylene microfibers.

    PubMed

    Haigh, Jodie N; Dargaville, Tim R; Dalton, Paul D

    2017-08-01

    The additive manufacturing of small diameter polypropylene microfibers is described, achieved using a technique termed melt electrospinning writing. Sequential fiber layering, which is important for accurate three-dimensional fabrication, was achieved with the smallest fiber diameter of 16.4±0.2μm obtained. The collector speed, temperature and melt flow rate to the nozzle were optimized for quality and minimal fiber pulsing. Of particular importance to the success of this method is appropriate heating of the collector plate, so that the electrostatically drawn filament adheres during the direct-writing process. By demonstrating the direct-writing of polypropylene, new applications exploiting the favorable mechanical, stability and biocompatible properties of this polymer are envisaged. Copyright © 2017. Published by Elsevier B.V.

  9. Reexamining the Affective Advantage of Peer Feedback in the ESL Writing Class.

    ERIC Educational Resources Information Center

    Zhang, Shuqiang

    1995-01-01

    Examines hypotheses concerning the appeal of three types of feedback in the second-language writing process: teacher-, peer-, and self-directed feedback. Results show that students overwhelmingly prefer teacher feedback to peer feedback. (Author/CK)

  10. Is Beauty in the Hand of the Writer? Influences of Aesthetic Preferences through Script Directions, Cultural, and Neurological Factors: A Literature Review

    PubMed Central

    Page, Alexander G.; McManus, Chris; González, Carmen P.; Chahboun, Sobh

    2017-01-01

    Human experience surrounding the appreciation of beauty is not static. Many factors such as script direction and cultural differences directly impact whether, how and why we consider images beautiful. In an earlier study, Pérez González showed that 19th-century Iranian and Spanish professional photographers manifest lateral biases linked to reading writing direction in their compositions. The present paper aims to provide a general review on this topic and intends to highlight the most relevant studies reporting preferences in the appreciation of beauty in individuals with different reading and writing directions and belonging to different cultural backgrounds. PMID:28824504

  11. SU-E-T-14: A Feasibility Study of Using Modified AP Proton Beam for Post-Operative Pancreatic Cancer Therapy

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Ding, X; Witztum, A; Kenton, O

    2014-06-01

    Purpose: Due to the unpredictability of bowel gas movement, the PA beam direction is always favored for robust proton therapy in post-operative pancreatic cancer treatment. We investigate the feasibility of replacing PA beam with a modified AP beam to take the bowel gas uncertainty into account. Methods: Nine post-operative pancreatic cancer patients treated with proton therapy (5040cGy, 28 fractions) in our institution were randomly selected. The original plan uses PA and lateral direction passive-scattering proton beams. Beam weighting is about 1:1. All patients received weekly verification CTs to assess the daily variations(total 17 verification CTs). The PA direction beam wasmore » replaced by two other groups of AP direction beam. Group AP: takes 3.5% range uncertainty into account. Group APmod: compensates the bowel gas uncertainty by expanding the proximal margin to 2cm more. The 2cm margin was acquired from the average bowel diameter in from 100 adult abdominal CT scans near pancreatic region (+/- 5cm superiorly and inferiorly). Dose Volume Histograms(DVHs) of the verification CTs were acquired for robustness study. Results: Without the lateral beam, Group APmod is as robust as Group PA. In Group AP, more than 10% of iCTV D98/D95 were reduced by 4–8%. LT kidney and Liver dose robustness are not affected by the AP/PA beam direction. There is 10% of chance that RT kidney and cord will be hit by AP proton beam due to the bowel gas. Compared to Group PA, APmod plan reduced the dose to kidneys and cord max significantly, while there is no statistical significant increase in bowel mean dose. Conclusion: APmod proton beam for the target coverage could be as robust as the PA direction without sacrificing too much of bowel dose. When the AP direction beam has to be selected, a 2cm proximal margin should be considered.« less

  12. Top-Down Nanofabrication and Characterization of 20 nm Silicon Nanowires for Biosensing Applications

    PubMed Central

    M. N, M. Nuzaihan; Hashim, U.; Md Arshad, M. K.; Ruslinda, A. Rahim; Rahman, S. F. A.; Fathil, M. F. M.; Ismail, Mohd. H.

    2016-01-01

    A top-down nanofabrication approach is used to develop silicon nanowires from silicon-on-insulator (SOI) wafers and involves direct-write electron beam lithography (EBL), inductively coupled plasma-reactive ion etching (ICP-RIE) and a size reduction process. To achieve nanometer scale size, the crucial factors contributing to the EBL and size reduction processes are highlighted. The resulting silicon nanowires, which are 20 nm in width and 30 nm in height (with a triangular shape) and have a straight structure over the length of 400 μm, are fabricated precisely at the designed location on the device. The device is applied in biomolecule detection based on the changes in drain current (Ids), electrical resistance and conductance of the silicon nanowires upon hybridization to complementary target deoxyribonucleic acid (DNA). In this context, the scaled-down device exhibited superior performances in terms of good specificity and high sensitivity, with a limit of detection (LOD) of 10 fM, enables for efficient label-free, direct and higher-accuracy DNA molecules detection. Thus, this silicon nanowire can be used as an improved transducer and serves as novel biosensor for future biomedical diagnostic applications. PMID:27022732

  13. Improvement in electron-beam lithography throughput by exploiting relaxed patterning fidelity requirements with directed self-assembly

    NASA Astrophysics Data System (ADS)

    Yu, Hao Yun; Liu, Chun-Hung; Shen, Yu Tian; Lee, Hsuan-Ping; Tsai, Kuen Yu

    2014-03-01

    Line edge roughness (LER) influencing the electrical performance of circuit components is a key challenge for electronbeam lithography (EBL) due to the continuous scaling of technology feature sizes. Controlling LER within an acceptable tolerance that satisfies International Technology Roadmap for Semiconductors requirements while achieving high throughput become a challenging issue. Although lower dosage and more-sensitive resist can be used to improve throughput, they would result in serious LER-related problems because of increasing relative fluctuation in the incident positions of electrons. Directed self-assembly (DSA) is a promising technique to relax LER-related pattern fidelity (PF) requirements because of its self-healing ability, which may benefit throughput. To quantify the potential of throughput improvement in EBL by introducing DSA for post healing, rigorous numerical methods are proposed to simultaneously maximize throughput by adjusting writing parameters of EBL systems subject to relaxed LER-related PF requirements. A fast, continuous model for parameter sweeping and a hybrid model for more accurate patterning prediction are employed for the patterning simulation. The tradeoff between throughput and DSA self-healing ability is investigated. Preliminary results indicate that significant throughput improvements are achievable at certain process conditions.

  14. Teaching Science Writing in an Introductory Lab Course

    PubMed Central

    Holstein, Sarah E.; Mickley Steinmetz, Katherine R.; Miles, John D.

    2015-01-01

    One challenge that many neuroscience instructors face is how to teach students to communicate within the field. The goal of this project was to improve students’ scientific writing in an introductory psychology laboratory course that serves as a feeder course into the neuroscience curriculum. This course included a scaffolded approach - breaking assignments into different sections that build upon each other to allow for more direction and feedback on each section. Students were also provided with examples of scientific writing, given direction on finding and reading journal articles, and were taught how to effectively peer review a paper. Research papers were assessed before (Year 1) and after (Year 2) this scaffolded approach was instituted. The assessment included measures of “Genre Knowledge” for each section of a research paper (abstract, introduction, method, results, discussion) as well as measures of “Writing Elements” (grammar, formatting, clarity, transitions, building to the hypothesis, using evidence). The results indicated that there was an improvement for Genre Knowledge scores when comparing Year 1 to Year 2. However, there was no systematic improvement in Writing Elements. This suggests that this teaching technique was most effective in improving students’ ability to write within the scientific genre. The logistics of implementing such an approach are discussed. PMID:25838801

  15. Uncoordinated MAC for Adaptive Multi Beam Directional Networks: Analysis and Evaluation

    DTIC Science & Technology

    2016-08-01

    control (MAC) policies for emerging systems that are equipped with fully digital antenna arrays which are capable of adaptive multi-beam directional...Adaptive Beam- forming, Multibeam, Directional Networking, Random Access, Smart Antennas I. INTRODUCTION Fully digital beamforming antenna arrays that...are capable of adaptive multi-beam communications are quickly becoming a reality. These antenna arrays allow users to form multiple simultaneous

  16. Volume gratings and welding of glass/plastic by femtosecond laser direct writing

    NASA Astrophysics Data System (ADS)

    Watanabe, Wataru

    2018-01-01

    Femtosecond laser direct writing is used to fabricate diffractive optical elements in three dimensions and to weld glass and/or plastic. In this paper, we review volume gratings in plastics and welding of glass/plastic by femtosecond laser direct writing. Volume gratings were embedded inside polymethyl methacrylate (PMMA) by femtosecond laser pulses. The diffraction efficiency of the gratings increased after fabrication and reached the maximum. After an initial slow decrease within first several days after the fabrication, the efficiency increased again. This phenomena was called regeneration of the grating. We also demonstrate welding of PMMA by dendrite pattern using femtosecond laser pulses. Laser pulses are focused at the interface of two PMMA substrates with an air gap and melted materials in laser-irradiated region spread within a gap of the substrates and dendrite morphology of melted PMMA was observed outside the laser irradiated area. Finally, we show welding of glass/plastic and metal.

  17. Quasi-crystalline and disordered photonic structures fabricated using direct laser writing

    NASA Astrophysics Data System (ADS)

    Sinelnik, Artem D.; Pinegin, Konstantin V.; Bulashevich, Grigorii A.; Rybin, Mikhail V.; Limonov, Mikhail F.; Samusev, Kirill B.

    2017-09-01

    Direct laser writing is a rapid prototyping technology that has been utilized for the fabrication of micro- and nano-scale materials that have a perfect structure in most of the cases. In this study we exploit the direct laser writing to create several classes of non-periodic materials, such as quasi-crystalline lattices and three-dimensional (3D) objects with an orientation disorder in structural elements. Among quasi-crystalline lattices we consider Penrose tiling and Lévy-type photonic glasses. Images of the fabricated structures are obtained with a scanning electron microscope. In experiment we study the optical diffraction from 3D woodpile photonic structures with orientation disorder and analyze diffraction patters observed on a flat screen positioned behind the sample. With increasing of the disorder degree, we find an impressive transformation of the diffraction patterns from perfect Laue picture to a speckle pattern.

  18. Formation of Si and Ge films and micropatterns by wet process using laser direct writing method

    NASA Astrophysics Data System (ADS)

    Watanabe, Akira

    2011-03-01

    The studies toward the formation of Si and Ge films and micropatterns by wet process using laser direct writing method are reported. First is the the formation of Si film by laser scanning irradiation to Si nano- or micro-particle dispersed films. By using organogermanium nanocluster (OrGe) as a dispersion medium of Si particles, a homogeneous Si film was formed by laser scanning irradiation on a Si particle/OrGe composite film. The micro-Raman spectra showed the formation of the polycrystalline Ge and SiGe alloy during the fusion of the Si particles by laser irradiation. The second is the formation of the Si and Ge micropatterns by LLDW (liquid phase laser direct writing) method. Micro-Raman spectra showed the formation of polycrystalline Si and Ge micropatterns by laser irradiation on the interfaces of SiCl4/substrate and GeCl4/substrate, respectively.

  19. Toward all-carbon electronics: fabrication of graphene-based flexible electronic circuits and memory cards using maskless laser direct writing.

    PubMed

    Liang, Jiajie; Chen, Yongsheng; Xu, Yanfei; Liu, Zhibo; Zhang, Long; Zhao, Xin; Zhang, Xiaoliang; Tian, Jianguo; Huang, Yi; Ma, Yanfeng; Li, Feifei

    2010-11-01

    Owing to its extraordinary electronic property, chemical stability, and unique two-dimensional nanostructure, graphene is being considered as an ideal material for the highly expected all-carbon-based micro/nanoscale electronics. Herein, we present a simple yet versatile approach to constructing all-carbon micro/nanoelectronics using solution-processing graphene films directly. From these graphene films, various graphene-based microcosmic patterns and structures have been fabricated using maskless computer-controlled laser cutting. Furthermore, a complete system involving a prototype of a flexible write-once-read-many-times memory card and a fast data-reading system has been demonstrated, with infinite data retention time and high reliability. These results indicate that graphene could be the ideal material for fabricating the highly demanded all-carbon and flexible devices and electronics using the simple and efficient roll-to-roll printing process when combined with maskless direct data writing.

  20. Controlling Second Harmonic Efficiency of Laser Beam Interactions

    NASA Technical Reports Server (NTRS)

    Barnes, Norman P. (Inventor); Walsh, Brian M. (Inventor); Reichle, Donald J. (Inventor)

    2011-01-01

    A method is provided for controlling second harmonic efficiency of laser beam interactions. A laser system generates two laser beams (e.g., a laser beam with two polarizations) for incidence on a nonlinear crystal having a preferred direction of propagation. Prior to incidence on the crystal, the beams are optically processed based on the crystal's beam separation characteristics to thereby control a position in the crystal along the preferred direction of propagation at which the beams interact.

  1. National Assessment of Writing: Useless and Uninteresting?

    ERIC Educational Resources Information Center

    Maxwell, John C.

    1973-01-01

    Points out flaws in the current National Assessment of Writing model and its results, but concludes that the National Assessment is a step in the right direction. (RB) Aspect of National Assessment (NAEP) dealt with in this document: Procedures (Exercise Development).

  2. Questions and Issues in Basic Writing and Computing (Computers and Controversy).

    ERIC Educational Resources Information Center

    Gay, Pamela

    1991-01-01

    Presents findings from 18 reviewed studies with regard to attitude and the quality of writing performance. Discusses pedagogy and the problem of defining basic writers. Suggests research directions that can help move educators toward a new pedagogy. (MG)

  3. Understanding the components of publication success: a survey of academic award recipients.

    PubMed

    Kenny, Anne M; Rowland, Heather; Gruman, Cynthia A

    2003-04-01

    This study examines predictors of publication number in career development awardees. We examined whether daily writing predicted publication number among junior faculty. We surveyed 94 career development awardees; the survey consisted of 28 questions in four domains: characteristics, environment, writing practices, and attitudes about writing. Variables that contributed positively to publication number included male gender and those with a negative effect were clinical research and perceiving the need to write as a requirement for advancement. In subgroup analysis of junior faculty, a habit of writing daily was predictive of greater publication numbers. Career development awardees published more first-authored manuscripts if they were male, were involved in nonclinical research, and did not perceive writing as a requirement for advancement. These factors highlight the need to explore the lower overall publication productivity in women and in clinical investigators. Junior faculty members that write daily publish more manuscripts, regardless of gender, research type, or motivators. The benefits of daily writing warrant direct study if not empiric implementation.

  4. Means for counteracting charged particle beam divergence

    DOEpatents

    Hooper, Jr., Edwin B.

    1978-01-01

    To counteract charge particle beam divergence, magnetic field-generating means are positioned along the edges of a charged particle beam to be controlled, such as to deflect and redirect particles tending to diverge from a desired beam direction. By selective arrangement of the magnetic field-generating means, the entire beam may be deflected and guided into different directions.

  5. Sensitivity studies of beam directionality, beam size, and neutron spectrum for a fission converter-based epithermal neutron beam for boron neutron capture therapy.

    PubMed

    Sakamoto, S; Kiger, W S; Harling, O K

    1999-09-01

    Sensitivity studies of epithermal neutron beam performance in boron neutron capture therapy are presented for realistic neutron beams with varying filter/moderator and collimator/delimiter designs to examine the relative importance of neutron beam spectrum, directionality, and size. Figures of merit for in-air and in-phantom beam performance are calculated via the Monte Carlo technique for different well-optimized designs of a fission converter-based epithermal neutron beam with head phantoms as the irradiation target. It is shown that increasing J/phi, a measure of beam directionality, does not always lead to corresponding monotonic improvements in beam performance. Due to the relatively low significance, for most configurations, of its effect on in-phantom performance and the large intensity losses required to produce beams with very high J/phi, beam directionality should not be considered an important figure of merit in epithermal neutron beam design except in terms of its consequences on patient positioning and collateral dose. Hardening the epithermal beam spectrum, while maintaining the specific fast neutron dose well below the inherent hydrogen capture dose, improves beam penetration and advantage depth and, as a desirable by-product, significantly increases beam intensity. Beam figures of merit are shown to be strongly dependent on beam size relative to target size. Beam designs with J/phi approximately 0.65-0.7, specific fast neutron doses of 2-2.6x10(-13) Gy cm2/n and beam sizes equal to or larger than the size of the head target produced the deepest useful penetration, highest therapeutic ratios, and highest intensities.

  6. Direction-dependent waist-shift-difference of Gaussian beam in a multiple-pass zigzag slab amplifier and geometrical optics compensation method.

    PubMed

    Li, Zhaoyang; Kurita, Takashi; Miyanaga, Noriaki

    2017-10-20

    Zigzag and non-zigzag beam waist shifts in a multiple-pass zigzag slab amplifier are investigated based on the propagation of a Gaussian beam. Different incident angles in the zigzag and non-zigzag planes would introduce a direction-dependent waist-shift-difference, which distorts the beam quality in both the near- and far-fields. The theoretical model and analytical expressions of this phenomenon are presented, and intensity distributions in the two orthogonal planes are simulated and compared. A geometrical optics compensation method by a beam with 90° rotation is proposed, which not only could correct the direction-dependent waist-shift-difference but also possibly average the traditional thermally induced wavefront-distortion-difference between the horizontal and vertical beam directions.

  7. Directionality of nose-emitted echolocation calls from bats without a nose leaf (Plecotus auritus).

    PubMed

    Jakobsen, Lasse; Hallam, John; Moss, Cynthia F; Hedenström, Anders

    2018-02-13

    All echolocating bats and whales measured to date emit a directional bio-sonar beam that affords them a number of advantages over an omni-directional beam, i.e. reduced clutter, increased source level and inherent directional information. In this study, we investigated the importance of directional sound emission for navigation through echolocation by measuring the sonar beam of brown long-eared bats, Plecotus auritus Plecotus auritus emits sound through the nostrils but has no external appendages to readily facilitate a directional sound emission as found in most nose emitters. The study shows that P. auritus , despite lacking an external focusing apparatus, emits a directional echolocation beam (directivity index=13 dB) and that the beam is more directional vertically (-6 dB angle at 22 deg) than horizontally (-6 dB angle at 35 deg). Using a simple numerical model, we found that the recorded emission pattern is achievable if P. auritus emits sound through the nostrils as well as the mouth. The study thus supports the hypothesis that a directional echolocation beam is important for perception through echolocation and we propose that animals with similarly non-directional emitter characteristics may facilitate a directional sound emission by emitting sound through both the nostrils and the mouth. © 2018. Published by The Company of Biologists Ltd.

  8. Two kinds of Airy-related beams

    NASA Astrophysics Data System (ADS)

    Xu, Yiqing; Zhou, Guoquan; Zhang, Lijun; Ru, Guoyun

    2015-08-01

    Two kinds of Airy-related beams are introduced in this manuscript. The normalized intensity distribution in the x-direction of the two kinds of Airy-related beams is close to that of the Gaussian beam. The normalized intensity distribution in the y-direction of the two kinds of Airy-related beams is close to that of the second-order and the third-order elegant Hermite-Gaussian beams, respectively. Analytical expressions of the two kinds of Airy-related beams passing through an ABCD paraxial optical system are derived. The beam propagation factors for the two kinds of Airy-related beams are 1.933 and 2.125, respectively. Analytical expressions of the beam half widths and the kurtosis parameters of the two kinds of Airy-related beams passing through an ABCD paraxial optical system are also presented. As a numerical example, the propagation properties of the two kinds of Airy-related beams are demonstrated in free space. Moreover, the comparison between the two kinds of Airy-related beams and their corresponding elegant Hermite-Gaussian beams along the two transverse directions are performed in detail. Upon propagation, the former kind of Airy-related beam will evolve from the central bright beam into the dark hollow beam. Contrarily, the latter kind of Airy-related beam will evolve from the dark hollow beam into the central bright beam. These two kinds of Airy-related beams can be used to describe specially distributed beams.

  9. 3D micro-lenses for free space intra-chip coupling in photonic-integrated circuits (Conference Presentation)

    NASA Astrophysics Data System (ADS)

    Thomas, Robert; Williams, Gwilym I.; Ladak, Sam; Smowton, Peter M.

    2017-02-01

    The integration of multiple optical elements on a common substrate to create photonic integrated circuits (PIC) has been successfully applied in: fibre-optic communications, photonic computing and optical sensing. The push towards III-Vs on silicon promises a new generation of integrated devices that combine the advantages of both integrated electronics and optics in a single substrate. III-V edge emitting laser diodes offer high efficiency and low threshold currents making them ideal candidates for the optically active elements of the next generation of PICs. Nevertheless, the highly divergent and asymmetric beam shapes intrinsic to these devices limits the efficiency with which optical elements can be free space coupled intra-chip; a capability particularly desirable for optical sensing applications e.g. [1]. Furthermore, the monolithic nature of the integrated approach prohibits the use of macroscopic lenses to improve coupling. However, with the advent of 3D direct laser writing, three dimensional lenses can now be manufactured on a microscopic-scale [2], making the use of micro-lens technology for enhanced free space coupling of integrated optical elements feasible. Here we demonstrate the first use of 3D micro-lenses to improve the coupling efficiency of monolithically integrated lasers. Fabricated from IP-dip photoresist using a Nanoscribe GmbH 3D lithography tool, the lenses are embedded directly onto a structured GaInP/AlGaInP substrate containing arrays of ridge lasers free space coupled to one another via a 200 μm air gap. We compare the coupling efficiency of these lasers with and without micro-lenses through photo-voltage and beam profile measurements and discuss optimisation of lens design.

  10. Electron-driven and thermal chemistry during water-assisted purification of platinum nanomaterials generated by electron beam induced deposition

    PubMed Central

    Warneke, Jonas; Kopyra, Janina

    2018-01-01

    Focused electron beam induced deposition (FEBID) is a versatile tool for the direct-write fabrication of nanostructures on surfaces. However, FEBID nanostructures are usually highly contaminated by carbon originating from the precursor used in the process. Recently, it was shown that platinum nanostructures produced by FEBID can be efficiently purified by electron irradiation in the presence of water. If such processes can be transferred to FEBID deposits produced from other carbon-containing precursors, a new general approach to the generation of pure metallic nanostructures could be implemented. Therefore this study aims to understand the chemical reactions that are fundamental to the water-assisted purification of platinum FEBID deposits generated from trimethyl(methylcyclopentadienyl)platinum(IV) (MeCpPtMe3). The experiments performed under ultrahigh vacuum conditions apply a combination of different desorption experiments coupled with mass spectrometry to analyse reaction products. Electron-stimulated desorption monitors species that leave the surface during electron exposure while post-irradiation thermal desorption spectrometry reveals products that evolve during subsequent thermal treatment. In addition, desorption of volatile products was also observed when a deposit produced by electron exposure was subsequently brought into contact with water. The results distinguish between contributions of thermal chemistry, direct chemistry between water and the deposit, and electron-induced reactions that all contribute to the purification process. We discuss reaction kinetics for the main volatile products CO and CH4 to obtain mechanistic information. The results provide novel insights into the chemistry that occurs during purification of FEBID nanostructures with implications also for the stability of the carbonaceous matrix of nanogranular FEBID materials under humid conditions. PMID:29441253

  11. Measurement of the muon beam direction and muon flux for the T2K neutrino experiment

    NASA Astrophysics Data System (ADS)

    Suzuki, K.; Aoki, S.; Ariga, A.; Ariga, T.; Bay, F.; Bronner, C.; Ereditato, A.; Friend, M.; Hartz, M.; Hiraki, T.; Ichikawa, A. K.; Ishida, T.; Ishii, T.; Juget, F.; Kikawa, T.; Kobayashi, T.; Kubo, H.; Matsuoka, K.; Maruyama, T.; Minamino, A.; Murakami, A.; Nakadaira, T.; Nakaya, T.; Nakayoshi, K.; Otani, M.; Oyama, Y.; Patel, N.; Pistillo, C.; Sakashita, K.; Sekiguchi, T.; Suzuki, S. Y.; Tada, S.; Yamada, Y.; Yamamoto, K.; Yokoyama, M.

    2015-05-01

    The Tokai-to-Kamioka (T2K) neutrino experiment measures neutrino oscillations by using an almost pure muon neutrino beam produced at the J-PARC accelerator facility. The T2K muon monitor was installed to measure the direction and stability of the muon beam which is produced in conjunction with the muon neutrino beam. The systematic error in the muon beam direction measurement was estimated, using data and MC simulation, to be 0.28 mrad. During beam operation, the proton beam has been controlled using measurements from the muon monitor and the direction of the neutrino beam has been tuned to within 0.3 mrad with respect to the designed beam-axis. In order to understand the muon beam properties, measurement of the absolute muon yield at the muon monitor was conducted with an emulsion detector. The number of muon tracks was measured to be (4.06± 0.05± 0.10)× 10^4cm^{-2} normalized with 4× 10^{11} protons on target with 250 kA horn operation. The result is in agreement with the prediction, which is corrected based on hadron production data.

  12. Fabrication of optical waveguides using laser direct writing method

    NASA Astrophysics Data System (ADS)

    Cho, Sung H.; Kim, Jung Min; Kim, Jae G.; Chang, Won S.; Lee, Eung S.

    2004-09-01

    Laser direct writing (LDW) process is developed using 3-rd harmonic Diode Pumped Solid State Laser (DPSSL) with the near UV wavelength of 355 nm. Photo-sensitive curable polymer is irradiated by UV laser and developed using polymer solvent to obtain quasi-3D patterns. We performed basic experiments for the various process conditions such as laser power, writing speed, laser focus, and optical polymer property to get the optimal conditions. This process could be applied to fabricate a single-mode waveguide without expensive mask projection method. Experimentally, the patterns of trapezoidal shape were manufactured into dimension of 8.4μm width and 7.5μm height. Propagation loss of planar waveguide was 1.42 dB/cm at wavelength of 1,550 nm.

  13. Integration of high power laser diodes with microoptical components in a compact pumping source for visible fiber laser

    NASA Astrophysics Data System (ADS)

    Goering, Rolf; Hoefer, Bernd; Kraeplin, Anke; Schreiber, Peter; Kley, Ernst-Bernhard; Schmeisser, Volkmar

    1999-04-01

    A novel technique, the so-called skew ray imaging concept, has been developed for beam transformation of high power diode laser bars. It leads to beam circularization with optimum brightness conservation. This concept uses two key microoptical components: a fast axis collimator microlens (FAC) of high isoplanatism and a special array of beam deflecting elements, the number of which corresponds to the single emitter number of the diode laser. Using this concept of skew ray imaging in a modified form, prototypes of pumping sources for visible fiber laser have been developed and built up. Several watts of optical power have been focused into a small spot of 25 micrometers with a numerical aperture of 0.35. GRIN cylindrical microlenses with 0.1 mm focal length and diffractive blazed gratings as redirector have been used. The grating periods of the redirector sections have been between 8 and 100 (mu) M. They have been produced by e-beam direct writing in resist. After optimization of the fabrication process the diffraction efficiencies of al sections have been beyond 86 percent with good reproducibility. Special techniques have been sued for system integration. The FAC microlenses have been attached to a copper lens holder with a subsequent gluing process of the holder to the laser diode heatsink. A UV-curable adhesive with extremely low shrinkage has been selected. The redirector element has been integrated with an additional possibility for lateral adjustment in order to compensate minor residual walk-off effects of the microlens when the laser power is varied from zero to maximum. A very compact pumping source of 3 inches X 1 inch X 1 inch dimensions has been realized with 5 W optical power in the desired spot. First diode pumped fiber laser operation in the visible has been demonstrated with this source.

  14. Design and fabrication of a high-precision cylinder beam expander

    NASA Astrophysics Data System (ADS)

    Zhang, Yong-hong; Yan, Hong; Xie, Bing; Li, Jian-ming; Luo, Zhong-xiang

    2018-03-01

    In order to compress the beam divergence angle and reduce the energy density, beam expansion system is widely used to expand the beam in laser system. Cylinder beam expander belongs to one-dimension expander, which expands the laser beam in only one direction (X direction or Y direction), a refraction cylinder expander whose beam diameter is 180mm×120mm and magnitude ratio is 12 is designed in this paper, the working wavelength is 1058nm. To solve the problem of inequality of the working wavelength and the testing wavelength, compensation method of using parallel plate to test the system aberration is proposed. By rough grinding (precision grinding) polish and the system grinding, the final system aberration is 0.24λ(peak-valley value)

  15. The rational design of a Au(I) precursor for focused electron beam induced deposition

    PubMed Central

    Marashdeh, Ali; Tiesma, Thiadrik; van Velzen, Niels J C; Harder, Sjoerd; Havenith, Remco W A; De Hosson, Jeff T M

    2017-01-01

    Au(I) complexes are studied as precursors for focused electron beam induced processing (FEBIP). FEBIP is an advanced direct-write technique for nanometer-scale chemical synthesis. The stability and volatility of the complexes are characterized to design an improved precursor for pure Au deposition. Aurophilic interactions are found to play a key role. The short lifetime of ClAuCO in vacuum is explained by strong, destabilizing Au–Au interactions in the solid phase. While aurophilic interactions do not affect the stability of ClAuPMe3, they leave the complex non-volatile. Comparison of crystal structures of ClAuPMe3 and MeAuPMe3 shows that Au–Au interactions are much weaker or partially even absent for the latter structure. This explains its high volatility. However, MeAuPMe3 dissociates unfavorably during FEBIP, making it an unsuitable precursor. The study shows that Me groups reduce aurophilic interactions, compared to Cl groups, which we attribute to electronic rather than steric effects. Therefore we propose MeAuCO as a potential FEBIP precursor. It is expected to have weak Au–Au interactions, making it volatile. It is stable enough to act as a volatile source for Au deposition, being stabilized by 6.5 kcal/mol. Finally, MeAuCO is likely to dissociate in a single step to pure Au. PMID:29354346

  16. The rational design of a Au(I) precursor for focused electron beam induced deposition.

    PubMed

    Marashdeh, Ali; Tiesma, Thiadrik; van Velzen, Niels J C; Harder, Sjoerd; Havenith, Remco W A; De Hosson, Jeff T M; van Dorp, Willem F

    2017-01-01

    Au(I) complexes are studied as precursors for focused electron beam induced processing (FEBIP). FEBIP is an advanced direct-write technique for nanometer-scale chemical synthesis. The stability and volatility of the complexes are characterized to design an improved precursor for pure Au deposition. Aurophilic interactions are found to play a key role. The short lifetime of ClAuCO in vacuum is explained by strong, destabilizing Au-Au interactions in the solid phase. While aurophilic interactions do not affect the stability of ClAuPMe 3 , they leave the complex non-volatile. Comparison of crystal structures of ClAuPMe 3 and MeAuPMe 3 shows that Au-Au interactions are much weaker or partially even absent for the latter structure. This explains its high volatility. However, MeAuPMe 3 dissociates unfavorably during FEBIP, making it an unsuitable precursor. The study shows that Me groups reduce aurophilic interactions, compared to Cl groups, which we attribute to electronic rather than steric effects. Therefore we propose MeAuCO as a potential FEBIP precursor. It is expected to have weak Au-Au interactions, making it volatile. It is stable enough to act as a volatile source for Au deposition, being stabilized by 6.5 kcal/mol. Finally, MeAuCO is likely to dissociate in a single step to pure Au.

  17. In-chip direct laser writing of a centimeter-scale acoustic micromixer

    NASA Astrophysics Data System (ADS)

    van't Oever, Jorick; Spannenburg, Niels; Offerhaus, Herman; van den Ende, Dirk; Herek, Jennifer; Mugele, Frieder

    2015-04-01

    A centimeter-scale micromixer was fabricated by two-photon polymerization inside a closed microchannel using direct laser writing. The structure consists of a repeating pattern of 20 μm×20 μm×155 μm acrylate pillars and extends over 1.2 cm. Using external ultrasonic actuation, the micropillars locally induce streaming with flow speeds of 30 μm s-1. The fabrication method allows for large flexibility and more complex designs.

  18. Gelatin-Based Laser Direct-Write Technique for the Precise Spatial Patterning of Cells

    PubMed Central

    Schiele, Nathan R.; Chrisey, Douglas B.

    2011-01-01

    Laser direct-writing provides a method to pattern living cells in vitro, to study various cell–cell interactions, and to build cellular constructs. However, the materials typically used may limit its long-term application. By utilizing gelatin coatings on the print ribbon and growth surface, we developed a new approach for laser cell printing that overcomes the limitations of Matrigel™. Gelatin is free of growth factors and extraneous matrix components that may interfere with cellular processes under investigation. Gelatin-based laser direct-write was able to successfully pattern human dermal fibroblasts with high post-transfer viability (91% ± 3%) and no observed double-strand DNA damage. As seen with atomic force microscopy, gelatin offers a unique benefit in that it is present temporarily to allow cell transfer, but melts and is removed with incubation to reveal the desired application-specific growth surface. This provides unobstructed cellular growth after printing. Monitoring cell location after transfer, we show that melting and removal of gelatin does not affect cellular placement; cells maintained registry within 5.6 ± 2.5 μm to the initial pattern. This study demonstrates the effectiveness of gelatin in laser direct-writing to create spatially precise cell patterns with the potential for applications in tissue engineering, stem cell, and cancer research. PMID:20849381

  19. Design of a magnetic-tunnel-junction-oriented nonvolatile lookup table circuit with write-operation-minimized data shifting

    NASA Astrophysics Data System (ADS)

    Suzuki, Daisuke; Hanyu, Takahiro

    2018-04-01

    A magnetic-tunnel-junction (MTJ)-oriented nonvolatile lookup table (LUT) circuit, in which a low-power data-shift function is performed by minimizing the number of write operations in MTJ devices is proposed. The permutation of the configuration memory cell for read/write access is performed as opposed to conventional direct data shifting to minimize the number of write operations, which results in significant write energy savings in the data-shift function. Moreover, the hardware cost of the proposed LUT circuit is small since the selector is shared between read access and write access. In fact, the power consumption in the data-shift function and the transistor count are reduced by 82 and 52%, respectively, compared with those in a conventional static random-access memory-based implementation using a 90 nm CMOS technology.

  20. Direct laser writing of graphene electronics.

    PubMed

    El-Kady, Maher F; Kaner, Richard B

    2014-09-23

    One of the fundamental issues with graphene for logic applications is its lack of a band gap. In this issue of ACS Nano, Shim and colleagues introduce an effective approach for modulating the current flow in graphene by forming p-n junctions using lasers. The findings could lead to a new route for controlling the electronic properties of graphene-based devices. We highlight recent progress in the direct laser synthesis and patterning of graphene for numerous applications. We also discuss the challenges and opportunities in translating this remarkable progress toward the direct laser writing of graphene electronics at large scales.

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