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Sample records for bipolar junction transistor

  1. Ion bipolar junction transistors

    PubMed Central

    Tybrandt, Klas; Larsson, Karin C.; Richter-Dahlfors, Agneta; Berggren, Magnus

    2010-01-01

    Dynamic control of chemical microenvironments is essential for continued development in numerous fields of life sciences. Such control could be achieved with active chemical circuits for delivery of ions and biomolecules. As the basis for such circuitry, we report a solid-state ion bipolar junction transistor (IBJT) based on conducting polymers and thin films of anion- and cation-selective membranes. The IBJT is the ionic analogue to the conventional semiconductor BJT and is manufactured using standard microfabrication techniques. Transistor characteristics along with a model describing the principle of operation, in which an anionic base current amplifies a cationic collector current, are presented. By employing the IBJT as a bioelectronic circuit element for delivery of the neurotransmitter acetylcholine, its efficacy in modulating neuronal cell signaling is demonstrated. PMID:20479274

  2. Ion bipolar junction transistors.

    PubMed

    Tybrandt, Klas; Larsson, Karin C; Richter-Dahlfors, Agneta; Berggren, Magnus

    2010-06-01

    Dynamic control of chemical microenvironments is essential for continued development in numerous fields of life sciences. Such control could be achieved with active chemical circuits for delivery of ions and biomolecules. As the basis for such circuitry, we report a solid-state ion bipolar junction transistor (IBJT) based on conducting polymers and thin films of anion- and cation-selective membranes. The IBJT is the ionic analogue to the conventional semiconductor BJT and is manufactured using standard microfabrication techniques. Transistor characteristics along with a model describing the principle of operation, in which an anionic base current amplifies a cationic collector current, are presented. By employing the IBJT as a bioelectronic circuit element for delivery of the neurotransmitter acetylcholine, its efficacy in modulating neuronal cell signaling is demonstrated.

  3. Magnetoamplification in a bipolar magnetic junction transistor.

    PubMed

    Rangaraju, N; Peters, J A; Wessels, B W

    2010-09-10

    We have demonstrated the first bipolar magnetic junction transistor using a dilute magnetic semiconductor. For an InMnAs p-n-p transistor magnetoamplification is observed at room temperature. The observed magnetoamplification is attributed to the magnetoresistance of the magnetic semiconductor InMnAs heterojunction. The magnetic field dependence of the transistor characteristics confirm that the magnetoamplification results from the junction magnetoresistance. To describe the experimentally observed transistor characteristics, we propose a modified Ebers-Moll model that includes a series magnetoresistance attributed to spin-selective conduction. The capability of magnetic field control of the amplification in an all-semiconductor transistor at room temperature potentially enables the creation of new computer logic architecture where the spin of the carriers is utilized.

  4. Polyphosphonium-based ion bipolar junction transistors

    PubMed Central

    Gabrielsson, Erik O.; Berggren, Magnus

    2014-01-01

    Advancements in the field of electronics during the past few decades have inspired the use of transistors in a diversity of research fields, including biology and medicine. However, signals in living organisms are not only carried by electrons but also through fluxes of ions and biomolecules. Thus, in order to implement the transistor functionality to control biological signals, devices that can modulate currents of ions and biomolecules, i.e., ionic transistors and diodes, are needed. One successful approach for modulation of ionic currents is to use oppositely charged ion-selective membranes to form so called ion bipolar junction transistors (IBJTs). Unfortunately, overall IBJT device performance has been hindered due to the typical low mobility of ions, large geometries of the ion bipolar junction materials, and the possibility of electric field enhanced (EFE) water dissociation in the junction. Here, we introduce a novel polyphosphonium-based anion-selective material into npn-type IBJTs. The new material does not show EFE water dissociation and therefore allows for a reduction of junction length down to 2 μm, which significantly improves the switching performance of the ion transistor to 2 s. The presented improvement in speed as well the simplified design will be useful for future development of advanced iontronic circuits employing IBJTs, for example, addressable drug-delivery devices. PMID:25553192

  5. Polyphosphonium-based ion bipolar junction transistors.

    PubMed

    Gabrielsson, Erik O; Tybrandt, Klas; Berggren, Magnus

    2014-11-01

    Advancements in the field of electronics during the past few decades have inspired the use of transistors in a diversity of research fields, including biology and medicine. However, signals in living organisms are not only carried by electrons but also through fluxes of ions and biomolecules. Thus, in order to implement the transistor functionality to control biological signals, devices that can modulate currents of ions and biomolecules, i.e., ionic transistors and diodes, are needed. One successful approach for modulation of ionic currents is to use oppositely charged ion-selective membranes to form so called ion bipolar junction transistors (IBJTs). Unfortunately, overall IBJT device performance has been hindered due to the typical low mobility of ions, large geometries of the ion bipolar junction materials, and the possibility of electric field enhanced (EFE) water dissociation in the junction. Here, we introduce a novel polyphosphonium-based anion-selective material into npn-type IBJTs. The new material does not show EFE water dissociation and therefore allows for a reduction of junction length down to 2 μm, which significantly improves the switching performance of the ion transistor to 2 s. The presented improvement in speed as well the simplified design will be useful for future development of advanced iontronic circuits employing IBJTs, for example, addressable drug-delivery devices.

  6. Free electron gas primary thermometer: The bipolar junction transistor

    SciTech Connect

    Mimila-Arroyo, J.

    2013-11-04

    The temperature of a bipolar transistor is extracted probing its carrier energy distribution through its collector current, obtained under appropriate polarization conditions, following a rigorous mathematical method. The obtained temperature is independent of the transistor physical properties as current gain, structure (Homo-junction or hetero-junction), and geometrical parameters, resulting to be a primary thermometer. This proposition has been tested using off the shelf silicon transistors at thermal equilibrium with water at its triple point, the transistor temperature values obtained involve an uncertainty of a few milli-Kelvin. This proposition has been successfully tested in the temperature range of 77–450 K.

  7. A gallium phosphide high-temperature bipolar junction transistor

    NASA Technical Reports Server (NTRS)

    Zipperian, T. E.; Dawson, L. R.; Chaffin, R. J.

    1981-01-01

    Preliminary results are reported on the development of a high temperature (350 C) gallium phosphide bipolar junction transistor (BJT) for geothermal and other energy applications. This four-layer p(+)n(-)pp(+) structure was formed by liquid phase epitaxy using a supercooling technique to insure uniform nucleation of the thin layers. Magnesium was used as the p-type dopant to avoid excessive out-diffusion into the lightly doped base. By appropriate choice of electrodes, the device may also be driven as an n-channel junction field-effect transistor. The initial design suffers from a series resistance problem which limits the transistor's usefulness at high temperatures.

  8. Toward complementary ionic circuits: the npn ion bipolar junction transistor.

    PubMed

    Tybrandt, Klas; Gabrielsson, Erik O; Berggren, Magnus

    2011-07-06

    Many biomolecules are charged and may therefore be transported with ionic currents. As a step toward addressable ionic delivery circuits, we report on the development of a npn ion bipolar junction transistor (npn-IBJT) as an active control element of anionic currents in general, and specifically, demonstrate actively modulated delivery of the neurotransmitter glutamic acid. The functional materials of this transistor are ion exchange layers and conjugated polymers. The npn-IBJT shows stable transistor characteristics over extensive time of operation and ion current switch times below 10 s. Our results promise complementary chemical circuits similar to the electronic equivalence, which has proven invaluable in conventional electronic applications.

  9. Modeling of charge transport in ion bipolar junction transistors.

    PubMed

    Volkov, Anton V; Tybrandt, Klas; Berggren, Magnus; Zozoulenko, Igor V

    2014-06-17

    Spatiotemporal control of the complex chemical microenvironment is of great importance to many fields within life science. One way to facilitate such control is to construct delivery circuits, comprising arrays of dispensing outlets, for ions and charged biomolecules based on ionic transistors. This allows for addressability of ionic signals, which opens up for spatiotemporally controlled delivery in a highly complex manner. One class of ionic transistors, the ion bipolar junction transistors (IBJTs), is especially attractive for these applications because these transistors are functional at physiological conditions and have been employed to modulate the delivery of neurotransmitters to regulate signaling in neuronal cells. Further, the first integrated complementary ionic circuits were recently developed on the basis of these ionic transistors. However, a detailed understanding of the device physics of these transistors is still lacking and hampers further development of components and circuits. Here, we report on the modeling of IBJTs using Poisson's and Nernst-Planck equations and the finite element method. A two-dimensional model of the device is employed that successfully reproduces the main characteristics of the measurement data. On the basis of the detailed concentration and potential profiles provided by the model, the different modes of operation of the transistor are analyzed as well as the transitions between the different modes. The model correctly predicts the measured threshold voltage, which is explained in terms of membrane potentials. All in all, the results provide the basis for a detailed understanding of IBJT operation. This new knowledge is employed to discuss potential improvements of ion bipolar junction transistors in terms of miniaturization and device parameters.

  10. Bipolar junction transistor models for circuit simulation of cosmic-ray-induced soft errors

    NASA Technical Reports Server (NTRS)

    Benumof, R.; Zoutendyk, J.

    1984-01-01

    This paper examines bipolar junction transistor models suitable for calculating the effects of large excursions of some of the variables determining the operation of a transistor. Both the Ebers-Moll and Gummel-Poon models are studied, and the junction and diffusion capacitances are evaluated on the basis of the latter model. The most interesting result of this analysis is that a bipolar junction transistor when struck by a cosmic particle may cause a single event upset in an electronic circuit if the transistor is operated at a low forward base-emitter bias.

  11. Theoretical values of various parameters in the Gummel-Poon model of a bipolar junction transistor

    NASA Technical Reports Server (NTRS)

    Benumof, R.; Zoutendyk, J.

    1986-01-01

    Various parameters in the Gummel-Poon model of a bipolar junction transistor are expressed in terms of the basic structure of a transistor. A consistent theoretical approach is used which facilitates an understanding of the foundations and limitations of the derived formulas. The results enable one to predict how changes in the geometry and composition of a transistor would affect performance.

  12. Silicon Nanomembrane Bipolar Junction Transistors for Microwave Frequency Applications

    NASA Astrophysics Data System (ADS)

    Bavier, John; Ballarotto, Vince; Cumings, John

    2014-03-01

    Silicon nanomembranes (SiNMs) are a promising material for flexible semiconductor devices due to their high carrier mobility and compatibility with standard CMOS processing. Previous studies have reported SiNM field-effect transistors with operating frequencies as high as 12 GHz. In order to expand the utility of SiNM devices, a method for the fabrication of monocrystalline microwave frequency silicon bipolar junction transistors (BJTs) will be presented. High-temperature processing of SiNM BJT devices is performed on a Silicon-on-Insulator (SOI) wafer. Using angled ion implantation, conformal chemical vapor deposition and anisotropic reactive ion etching, a poly-silicon sidewall spacer is formed. This spacer defines a base region approximately 200nm wide without the use of electron beam lithography. Devices are then released using selective wet etching in HF and transferred to alternate flexible substrates. Microwave frequency data will be presented, and the effects of the transfer process on device performance will be discussed.

  13. Radiation effects on junction field-effect transistors (JFETS), MOSFETs, and bipolar transistors, as related to SSC circuit design

    SciTech Connect

    Kennedy, E.J. Oak Ridge National Lab., TN ); Alley, G.T.; Britton, C.L. Jr. ); Skubic, P.L. ); Gray, B.; Wu, A. )

    1990-01-01

    Some results of radiation effects on selected junction field-effect transistors, MOS field-effect transistors, and bipolar junction transistors are presented. The evaluations include dc parameters, as well as capacitive variations and noise evaluations. The tests are made at the low current and voltage levels (in particular, at currents {le}1 mA) that are essential for the low-power regimes required by SSC circuitry. Detailed noise data are presented both before and after 5-Mrad (gamma) total-dose exposure. SPICE radiation models for three high-frequency bipolar processes are compared for a typical charge-sensitive preamplifier.

  14. Radiation induced deep level defects in bipolar junction transistors under various bias conditions

    NASA Astrophysics Data System (ADS)

    Liu, Chaoming; Yang, Jianqun; Li, Xingji; Ma, Guoliang; Xiao, Liyi; Bollmann, Joachim

    2015-12-01

    Bipolar junction transistor (BJT) is sensitive to ionization and displacement radiation effects in space. In this paper, 35 MeV Si ions were used as irradiation source to research the radiation damage on NPN and PNP bipolar transistors. The changing of electrical parameters of transistors was in situ measured with increasing irradiation fluence of 35 MeV Si ions. Using deep level transient spectroscopy (DLTS), defects in the bipolar junction transistors under various bias conditions are measured after irradiation. Based on the in situ electrical measurement and DLTS spectra, it is clearly that the bias conditions can affect the concentration of deep level defects, and the radiation damage induced by heavy ions.

  15. Silicon on insulator bipolar junction transistors for flexible microwave applications

    NASA Astrophysics Data System (ADS)

    Bavier, John McGoldrick

    Microwave frequency flexible electronic devices require a high quality semiconducting material and a set of fabrication techniques that are compatible with device integration onto flexible polymer substrates. Over the past ten years, monocrystalline silicon nanomembranes (SiNMs) have been studied as a flexible semiconducting material that is compatible with industrial Si processing. Fabricated from commercial silicon on insulator (SOI) wafers, SiNMs can be transferred to flexible substrates using a variety of techniques. Due to their high carrier mobilities, SiNMs are a promising candidate for flexible microwave frequency devices. This dissertation presents fabrication techniques for flexible SiNM devices in general, as well as the progress made towards the development of a microwave frequency SiNM bipolar junction transistor (BJT). In order to overcome previous limitations associated with adhesion, novel methods for transfer printing of metal films and SiNMs are presented. These techniques enable transfer printing of a range of metal films and improve the alignment of small transfer printed SiNM devices. Work towards the development of a microwave frequency BJT on SOI for SiNM devices is also described. Utilizing a self-aligned polysilicon sidewall spacer technique, a BJT with an ultra-narrow base region is fabricated and tested. Two regimes of operation are identified and characterized under DC conditions. At low base currents, devices exhibited forward current gain as high as betaF = 900. At higher base current values, a transconductance of 59 mS was observed. Microwave scattering parameters were obtained for the BJTs under both biasing conditions and compared to unbiased measurements. Microwave frequency gain was not observed. Instead, bias-dependent non-reciprocal behavior was observed and examined. Limitations associated with the microwave impedance-matched electrode configuration are presented. High current densities in the narrow electrodes cause localized

  16. Neutron Radiation Effect On 2N2222 And NTE 123 NPN Silicon Bipolar Junction Transistors

    NASA Astrophysics Data System (ADS)

    Oo, Myo Min; Rashid, N. K. A. Md; Karim, J. Abdul; Zin, M. R. Mohamed; Hasbullah, N. F.

    2013-12-01

    This paper examines neutron radiation with PTS (Pneumatic Transfer System) effect on silicon NPN bipolar junction transistors (2N2222 and NTE 123) and analysis of the transistors in terms of electrical characterization such as current gain after neutron radiation. The key parameters are measured with Keithley 4200SCS. Experiment results show that the current gain degradation of the transistors is very sensitive to neutron radiation. The neutron radiation can cause displacement damage in the bulk layer of the transistor structure. The current degradation is believed to be governed by increasing recombination current between the base and emitter depletion region.

  17. Using Animation to Improve the Students' Academic Achievement on Bipolar Junction Transistor

    ERIC Educational Resources Information Center

    Zoabi, W.; Sabag, N.; Gero, A.

    2012-01-01

    Teaching abstract subjects to students studying towards a degree in electronics practical engineering (a degree between a technician and an engineer) requires didactic tools that enable understanding of issues without using advanced mathematics and physics. One basic issue is the BJT (Bipolar Junction Transistor) that requires preliminary…

  18. Implantation-Free 4H-SiC Bipolar Junction Transistors with Double Base Epi-layers

    DTIC Science & Technology

    2007-05-14

    gain 4H-SiC NPN power bipolar junction transistor ,” IEEE Electron Device Letters, vol. 24, pp. 327-329, May 2003. [3] C.-F. Huang and J. A. Cooper...Jr., “High current gain 4H-SiC NPN Bipolar Junction Transistors ,” IEEE Electron Device Letters, vol. 24, pp. 396-398, Jun. 2003. [4] Sumi...Implantation-Free 4H-SiC Bipolar Junction Transistors with Double Base Epi-layers Jianhui Zhang, member, IEEE, Xueqing, Li, Petre Alexandrov

  19. Radiation defects studies on silicon bipolar junction transistor irradiated by Br ions and electrons

    NASA Astrophysics Data System (ADS)

    Liu, Chaoming; Li, Xingji; Yang, Jianqun; Ma, Guoliang; Xiao, Liyi; Bollmann, Joachim

    2015-12-01

    Bipolar junction transistors are sensitive to both ionization and displacement damage due to charged particles from space radiation. Passivating oxides and the SiO2/Si interface are more sensitive to ionization damage whereas displacement damage may strongly influence the bulk properties of a device. Fast electrons with energies below a few MeV introduces exclusively target ionization while heavy ions at moderate energies (lower than 2 MeV/amu) results in displacement damage due to individual Frenkel-pairs generation. Although both kinds of radiation are basically independent an effective correlation was seen in the electronic characteristics of transistors. We report on the effects on current gain and current-voltage characteristics of bipolar junction transistors due to successive irradiation with 20 MeV Br ions and 110 keV electrons.

  20. Comparison between Field Effect Transistors and Bipolar Junction Transistors as Transducers in Electrochemical Sensors

    NASA Astrophysics Data System (ADS)

    Zafar, Sufi; Lu, Minhua; Jagtiani, Ashish

    2017-01-01

    Field effect transistors (FET) have been widely used as transducers in electrochemical sensors for over 40 years. In this report, a FET transducer is compared with the recently proposed bipolar junction transistor (BJT) transducer. Measurements are performed on two chloride electrochemical sensors that are identical in all details except for the transducer device type. Comparative measurements show that the transducer choice significantly impacts the electrochemical sensor characteristics. Signal to noise ratio is 20 to 2 times greater for the BJT sensor. Sensitivity is also enhanced: BJT sensing signal changes by 10 times per pCl, whereas the FET signal changes by 8 or less times. Also, sensor calibration curves are impacted by the transducer choice. Unlike a FET sensor, the calibration curve of the BJT sensor is independent of applied voltages. Hence, a BJT sensor can make quantitative sensing measurements with minimal calibration requirements, an important characteristic for mobile sensing applications. As a demonstration for mobile applications, these BJT sensors are further investigated by measuring chloride levels in artificial human sweat for potential cystic fibrosis diagnostic use. In summary, the BJT device is demonstrated to be a superior transducer in comparison to a FET in an electrochemical sensor.

  1. Comparison between Field Effect Transistors and Bipolar Junction Transistors as Transducers in Electrochemical Sensors

    PubMed Central

    Zafar, Sufi; Lu, Minhua; Jagtiani, Ashish

    2017-01-01

    Field effect transistors (FET) have been widely used as transducers in electrochemical sensors for over 40 years. In this report, a FET transducer is compared with the recently proposed bipolar junction transistor (BJT) transducer. Measurements are performed on two chloride electrochemical sensors that are identical in all details except for the transducer device type. Comparative measurements show that the transducer choice significantly impacts the electrochemical sensor characteristics. Signal to noise ratio is 20 to 2 times greater for the BJT sensor. Sensitivity is also enhanced: BJT sensing signal changes by 10 times per pCl, whereas the FET signal changes by 8 or less times. Also, sensor calibration curves are impacted by the transducer choice. Unlike a FET sensor, the calibration curve of the BJT sensor is independent of applied voltages. Hence, a BJT sensor can make quantitative sensing measurements with minimal calibration requirements, an important characteristic for mobile sensing applications. As a demonstration for mobile applications, these BJT sensors are further investigated by measuring chloride levels in artificial human sweat for potential cystic fibrosis diagnostic use. In summary, the BJT device is demonstrated to be a superior transducer in comparison to a FET in an electrochemical sensor. PMID:28134275

  2. Comparison between Field Effect Transistors and Bipolar Junction Transistors as Transducers in Electrochemical Sensors.

    PubMed

    Zafar, Sufi; Lu, Minhua; Jagtiani, Ashish

    2017-01-30

    Field effect transistors (FET) have been widely used as transducers in electrochemical sensors for over 40 years. In this report, a FET transducer is compared with the recently proposed bipolar junction transistor (BJT) transducer. Measurements are performed on two chloride electrochemical sensors that are identical in all details except for the transducer device type. Comparative measurements show that the transducer choice significantly impacts the electrochemical sensor characteristics. Signal to noise ratio is 20 to 2 times greater for the BJT sensor. Sensitivity is also enhanced: BJT sensing signal changes by 10 times per pCl, whereas the FET signal changes by 8 or less times. Also, sensor calibration curves are impacted by the transducer choice. Unlike a FET sensor, the calibration curve of the BJT sensor is independent of applied voltages. Hence, a BJT sensor can make quantitative sensing measurements with minimal calibration requirements, an important characteristic for mobile sensing applications. As a demonstration for mobile applications, these BJT sensors are further investigated by measuring chloride levels in artificial human sweat for potential cystic fibrosis diagnostic use. In summary, the BJT device is demonstrated to be a superior transducer in comparison to a FET in an electrochemical sensor.

  3. Junction-to-Case Thermal Resistance of a Silicon Carbide Bipolar Junction Transistor Measured

    NASA Technical Reports Server (NTRS)

    Niedra, Janis M.

    2006-01-01

    Junction temperature of a prototype SiC-based bipolar junction transistor (BJT) was estimated by using the base-emitter voltage (V(sub BE)) characteristic for thermometry. The V(sub BE) was measured as a function of the base current (I(sub B)) at selected temperatures (T), all at a fixed collector current (I(sub C)) and under very low duty cycle pulse conditions. Under such conditions, the average temperature of the chip was taken to be the same as that of the temperature-controlled case. At increased duty cycle such as to substantially heat the chip, but same I(sub C) pulse height, the chip temperature was identified by matching the V(sub BE) to the thermometry curves. From the measured average power, the chip-to-case thermal resistance could be estimated, giving a reasonable value. A tentative explanation for an observed bunching with increasing temperature of the calibration curves may relate to an increasing dopant atom ionization. A first-cut analysis, however, does not support this.

  4. Bipolar Junction Transistors in Two-Dimensional WSe2 with Large Current and Photocurrent Gains.

    PubMed

    Agnihotri, Pratik; Dhakras, Prathamesh; Lee, Ji Ung

    2016-07-13

    In the development of semiconductor devices, the bipolar junction transistor (BJT) features prominently as being the first solid state transistor that helped to usher in the digital revolution. For any new semiconductor, therefore, the fabrication and characterization of the BJT are important for both technological importance and historical significance. Here, we demonstrate a BJT device in exfoliated TMD semiconductor WSe2. We use buried gates to electrostatically create doped regions with back-to-back p-n junctions. We demonstrate two central characteristics of a bipolar device: current gain when operated as a BJT and a photocurrent gain when operated as a phototransistor. We demonstrate a current gain of 1000 and photocurrent gain of 40 and describe features that enhance these properties due to the doping technique that we employ.

  5. Bias dependence of synergistic radiation effects induced by electrons and protons on silicon bipolar junction transistors

    NASA Astrophysics Data System (ADS)

    Liu, Chaoming; Li, Xingji; Yang, Jianqun; Ma, Guoliang; Xiao, Liyi

    2015-06-01

    Bias dependence on synergistic radiation effects caused by 110 keV electrons and 170 keV protons on the current gain of 3DG130 NPN bipolar junction transistors (BJTs) is studied in this paper. Experimental results indicate that the influence induced by 170 keV protons is always enhancement effect during the sequential irradiation. However, the influence induced by 110 keV electrons on the BJT under various bias cases is different during the sequential irradiation. The transition fluence of 110 keV electrons is dependent on the bias case on the emitter-base junction of BJT.

  6. Laser Pulse Tests of Bipolar Junction Transistors (BJTs) for SET Analysis

    NASA Astrophysics Data System (ADS)

    Daniel, C.; Plettner, C.; Poivey, C.; Schuttauf, A.; Tonicello, F.; Triggianese, M.

    2014-08-01

    In order to study the Single Event Transient (SET) sensitivity of discrete bipolar junction transistors, laser tests conducted at EADS Innovation Works in Sureness are presented and discussed. A number of different BJT samples have been tested in different operating conditions. The tests demonstrate that: discrete BJTs are indeed sensitive to collected charge; the most sensitive region is the collector/base junctions and that the different internal structure gives different SET shapes. We present measurements, simulation and comparison for SET modeled in PSPICE and tested with a laser.

  7. Thermodynamic Field Theory of the Dynamic Behavior of Bipolar Junction Transistors.

    NASA Astrophysics Data System (ADS)

    Aboulwafa, Mohamed El-Sayed

    Bipolar junction transistors play an important role in integrated-circuits, whether monolithic, or hybrid. Integrated circuit designers are obliged to use as many transistors as they can in their design, since this entails very little increase in cost. More importantly, a bipolar transistor in an integrated circuit can be connected to substitute for other components that are hard to be integrated in the same substrate. The thermodynamic field theory of generalized fields (TTGF) has had success for predicting the voltage current relationship in p-n junctions and solar cells in d-c cases. The primary object of this thesis is to apply the thermodynamic field theory to an interfacial problem which has time-varying fields. Specifically, we shall apply the concepts of TTGF to investigate the dynamic response of p-n junction devices when fed a small a-c signal. In previous applications of the TTGF, single junction devices have been considered. In this study, we apply the TTGF to a multijunction device: the bipolar transistor. In Chapter I, a brief introduction and literature review are given. In Chapter II, an introduction to the TTGF is given. Included also is a recently derived TTGF equation which governs the interaction of time varying fields in a system involving interfaces and carriers which may recombine and accumulate. Chapter III is a review for the one dimensional solution of the continuity equation. Both the d-c and a-c solutions are reviewed. In Chapter IV, the reverse biased junction is covered from the point of view of the TTGF. Force fields are identified, evaluated and the work done on the composite carrier in the respective regions is calculated. Chapter V covers the forward biased junction. Work done by force fields has been calculated. Energy due to carrier accumulation and recombination has been calculated. The law of conservation energy has been applied over the emitter-base and the emitter-base-collector loops. From the resulting equations, the input

  8. Large-scale transient sensitivity analysis of a radiation damaged bipolar junction transistor.

    SciTech Connect

    Hoekstra, Robert John; Gay, David M.; Bartlett, Roscoe Ainsworth; Phipps, Eric Todd

    2007-11-01

    Automatic differentiation (AD) is useful in transient sensitivity analysis of a computational simulation of a bipolar junction transistor subject to radiation damage. We used forward-mode AD, implemented in a new Trilinos package called Sacado, to compute analytic derivatives for implicit time integration and forward sensitivity analysis. Sacado addresses element-based simulation codes written in C++ and works well with forward sensitivity analysis as implemented in the Trilinos time-integration package Rythmos. The forward sensitivity calculation is significantly more efficient and robust than finite differencing.

  9. Electrical determination of the bandgap energies of the emitter and base regions of bipolar junction transistors

    NASA Astrophysics Data System (ADS)

    Mimila-Arroyo, J.

    2016-10-01

    A pure electrical method is presented to extract emitter and base bandgaps of a bipolar junction transistor (BJT) at the locations where the minority carrier injection takes place. It is based on the simultaneous measurement of the collector and base currents as a function of the emitter-base forward bias (Gummer plot) and the corresponding current gain. From the obtained saturation currents as a function of temperature, we extract the bandgap energies. The accuracy of the method is demonstrated for InGaP-GaAs, Si, and Ge commercial devices. For InGaP-GaAs transistors, the results can be understood if the emitter-base heterojunction is not an abrupt but a gradual one. The presented method is a reliable tool that can aid in the development of new compound semiconductor based BJTs whose bandgap energies are highly sensitive to their composition.

  10. Urea biosensor based on an extended-base bipolar junction transistor.

    PubMed

    Sun, Tai-Ping; Shieh, Hsiu-Li; Liu, Chun-Lin; Chen, Chung-Yuan

    2014-01-01

    In this study, a urea biosensor was prepared by the immobilization of urease onto the sensitive membrane of an extended-base bipolar junction transistor. The pH variation was used to detect the concentration of urea. The SnO2/ITO glass, fabricated by sputtering SnO2 on the conductive ITO glass, was used as a pH-sensitive membrane, which was connected with a commercial bipolar junction transistor device. The gels, fabricated by the poly vinyl alcohol with pendent styrylpyridinium groups, were used to immobilize the urease. This readout circuit, fabricated in a 0.35-um CMOS 2P4M process, operated at 3.3V supply voltage. This circuit occupied an area of 1.0 mm × 0.9 mm. The dynamic range of the urea biosensor was from 1.4 to 64 mg/dl at the 10 mM phosphate buffer solution and the sensitivity of this range was about 65.8 mV/pUrea. The effect of urea biosensors with different pH values was considered, and the characteristics of urea biosensors based on EBBJT were described.

  11. Radiation effects on bipolar junction transistors and integrated circuits produced by different energy Br ions

    NASA Astrophysics Data System (ADS)

    Li, Xingji; Geng, Hongbin; Liu, Chaoming; Zhao, Zhiming; Lan, Mujie; Yang, Dezhuang; He, Shiyu

    2009-12-01

    The radiation responses of the NPN bipolar junction transistors (BJTs) and the TTL bipolar integrated circuits (ICs) have been examined using 20, 40 and 60 MeV Br ions. Key electric parameter was measured and compared after each energy irradiation. Experimental results demonstrate that the degradation in electric parameters caused by the Br ions shows a common feature for the NPN BJTs and TTL ICs, in which the degradation is strengthened with decreasing the Br ions energy. The ionizing dose ( D i) and displacement dose ( D d) as a function of the chip depth in the bipolar devices were calculated using the SRIM code, in order to analyze the radiation effects on the NPN BJTs and the Bipolar ICs. From the experiment and calculation results, it could be deduced that the Br ions mainly cause displacement damage to both the NPN BJTs and the TTL ICs, and the higher the ratio of D d/( D d+D i), the larger the degradation in electric parameters at a given total dose.

  12. Origin of 1/f PM and AM noise in bipolar junction transistor amplifiers.

    PubMed

    Walls, F L; Ferre-Pikal, E S; Jefferts, S R

    1997-01-01

    In this paper we report the results of extensive research on phase modulation (PM) and amplitude modulation (AM) noise in linear bipolar junction transistor (BJT) amplifiers. BJT amplifiers exhibit 1/f PM and AM noise about a carrier signal that is much larger than the amplifiers thermal noise at those frequencies in the absence of the carrier signal. Our work shows that the 1/f PM noise of a BJT based amplifier is accompanied by 1/f AM noise which can be higher, lower, or nearly equal, depending on the circuit implementation. The 1/f AM and PM noise in BJTs is primarily the result of 1/f fluctuations in transistor current, transistor capacitance, circuit supply voltages, circuit impedances, and circuit configuration. We discuss the theory and present experimental data in reference to common emitter amplifiers, but the analysis can be applied to other configurations as well. This study provides the functional dependence of 1/f AM and PM noise on transistor parameters, circuit parameters, and signal frequency, thereby laying the groundwork for a comprehensive theory of 1/f AM and PM noise in BJT amplifiers. We show that in many cases the 1/f PM and AM noise can be reduced below the thermal noise of the amplifier.

  13. Accelerated tests for bounding the low dose rate radiation response of lateral PNP bipolar junction transistors

    SciTech Connect

    Witczak, S.C.; Schrimpf, R.D.; Galloway, K.F.; Schmidt, D.M.; Fleetwood, D.M.; Pease, R.L.; Coombs, W.E.; Suehle, J.S.

    1996-03-01

    Low dose rate gain degradation of lateral pnp bipolar transistors can be simulated by accelerated irradiations performed at approximately 135 degrees C. Degradation enhancement is explained by temperature- dependent radiation-induced interface trap formation above the transistor`s base.

  14. 4H-SiC Power Bipolar Junction Transistor with a Very Low Specific On-resistance of 2.9 mOmega.cm2

    DTIC Science & Technology

    2006-04-12

    pp1381-1382, 2004. [2] C.-F. Huang and J. A. Cooper, Jr., “High current gain 4H-SiC NPN Bipolar Junction Transistors ,” IEEE Electron Device Lett...4H-SiC Power Bipolar Junction Transistor with a Very Low Specific On-resistance of 2.9 mΩ.cm2 Jianhui Zhang, member, IEEE, Petre Alexandrov...specific on-resistance (Rsp,on) of power 4H-SiC bipolar junction transistors (BJT). A 4H-SiC BJT based on a 12 um drift-layer shows a record low

  15. Implementation of total dose effects in the bipolar junction transistor Gummel-Poon model

    SciTech Connect

    Montagner, X.; Fouillat, P.; Briand, R.; Touboul, A.; Schrimpf, R.D.; Galloway, K.F.; Calvet, M.C.; Calvel, P.

    1997-12-01

    The effects of total dose on the SPICE model of bipolar junction transistors are investigated. The limitations of the standard Gummel-Poon model for simulating the radiation-induced excess base current are analyzed, and a new model based on an empirical approach is proposed. Four new SPICE rad-parameters are presented, and investigated for different dose rates. The relevant parameters are extracted using a new algorithmic procedure, combining a genetic approach and the standard optimization technique which minimizes the RMS error between measured and simulated excess base current. It is shown that the excess base current is accurately described by the same formula whatever the device type is. An empirical fitting of the rad-parameters as a function of total dose is proposed to use in hardening electronic circuits for space-like environments.

  16. Radiation effects on bipolar junction transistors induced by 25 MeV carbon ions

    NASA Astrophysics Data System (ADS)

    Liu, Chaoming; Li, Xingji; Geng, Hongbin; Zhao, Zhiming; Yang, Dezhuang; He, Shiyu

    2010-12-01

    The characteristic degradation in silicon NPN bipolar junction transistors (BJTs) of 3DG112 type is examined under the irradiation with 25 MeV carbon (C) ions and various bias conditions. Different electrical parameters were measured in-situ during the exposure under each bias condition. From the experimental data, larger variation of base current ( IB) is observed after irradiation at a given value of base-emitter voltage ( VBE), while the collector current is only slightly affected by irradiation at a given VBE. The gain degradation is mostly affected by the behavior of the base current. The change in the reciprocal of current gain (Δ(1/ β)) increases linearly with increasing the C ions fluence. The degradation of the NPN BJTs under various bias conditions during irradiation was studied. Compared to the case where the terminals are grounded, at a given fluence, the change in the reciprocal of current gain varies slightly less when the base-emitter junction is forward biased. On the other hand, there is no distinction for the change in the reciprocal of current gain between the case of reverse-biased base-emitter junction and that of all terminals grounded for the NPN BJTs at a given fluence.

  17. Annealing effects and DLTS study on NPN silicon bipolar junction transistors irradiated by heavy ions

    NASA Astrophysics Data System (ADS)

    Liu, Chaoming; Li, Xingji; Yang, Jianqun; Rui, Erming

    2014-01-01

    Isochronal anneal sequences have been carried out on 3DG112 silicon NPN bipolar junction transistors (BJTs) irradiated with 20 MeV bromine (Br) heavy ions. The Gummel curve is utilized to characterize the annealing behavior of defects in both the emitter-base depletion region and the neutral base. We find that the base current (IB) decreases with the increasing annealing temperature, while the collector current (IC) remains invariable. The current gain varies slightly, when the annealing temperature (TA) is lower than 400 K, while varies rapidly at TA<450 K, and the current gain of the 3DG112 BJT annealing at 700 K almost restore to that of the pre-radiation transistor. Deep level transient spectroscopy (DLTS) data is used to assign the relative magnitude of each of the important defects. Based on the in situ electrical measurement and DLTS spectra, it is clear that the V2(-/0)+V-P traps are the main contribution to the degradation of current gain after the 20 MeV Br ions irradiation. The V2(-/0)+V-P peak has many of the characteristics expected for the current gain degradation.

  18. Incident particle range dependence of radiation damage in a power bipolar junction transistor

    NASA Astrophysics Data System (ADS)

    Liu, Chao-Ming; Li, Xing-Ji; Geng, Hong-Bin; Rui, Er-Ming; Guo, Li-Xin; Yang, Jian-Qun

    2012-10-01

    The characteristic degradations in silicon NPN bipolar junction transistors (BJTs) of type 3DD155 are examined under the irradiations of 25-MeV carbon (C), 40-MeV silicon (Si), and 40-MeV chlorine (Cl) ions respectively. Different electrical parameters are measured in-situ during the exposure of heavy ions. The experimental data shows that the changes in the reciprocal of the gain variation (Δ(1/β)) of 3DD155 transistors irradiated respectively by 25-MeV C, 40-MeV Si, and 40-MeV Cl ions each present a nonlinear behaviour at a low fluence and a linear response at a high fluence. The Δ(1/β) of 3DD155 BJT irradiated by 25-MeV C ions is greatest at a given fluence, a little smaller when the device is irradiated by 40-MeV Si ions, and smallest in the case of the 40-MeV Cl ions irradiation. The measured and calculated results clearly show that the range of heavy ions in the base region of BJT affects the level of radiation damage.

  19. Simulation of neutron displacement damage in bipolar junction transistors using high-energy heavy ion beams.

    SciTech Connect

    Doyle, Barney Lee; Buller, Daniel L.; Hjalmarson, Harold Paul; Fleming, Robert M; Bielejec, Edward Salvador; Vizkelethy, Gyorgy

    2006-12-01

    Electronic components such as bipolar junction transistors (BJTs) are damaged when they are exposed to radiation and, as a result, their performance can significantly degrade. In certain environments the radiation consists of short, high flux pulses of neutrons. Electronics components have traditionally been tested against short neutron pulses in pulsed nuclear reactors. These reactors are becoming less and less available; many of them were shut down permanently in the past few years. Therefore, new methods using radiation sources other than pulsed nuclear reactors needed to be developed. Neutrons affect semiconductors such as Si by causing atomic displacements of Si atoms. The recoiled Si atom creates a collision cascade which leads to displacements in Si. Since heavy ions create similar cascades in Si we can use them to create similar damage to what neutrons create. This LDRD successfully developed a new technique using easily available particle accelerators to provide an alternative to pulsed nuclear reactors to study the displacement damage and subsequent transient annealing that occurs in various transistor devices and potentially qualify them against radiation effects caused by pulsed neutrons.

  20. Radiation-induced 1/f noise degradation of PNP bipolar junction transistors at different dose rates

    NASA Astrophysics Data System (ADS)

    Qi-Feng, Zhao; Yi-Qi, Zhuang; Jun-Lin, Bao; Wei, Hu

    2016-04-01

    It is found that ionizing-radiation can lead to the base current and the 1/f noise degradations in PNP bipolar junction transistors. In this paper, it is suggested that the surface of the space charge region of the emitter-base junction is the main source of the base surface 1/f noise. A model is developed which identifies the parameters and describes their interactive contributions to the recombination current at the surface of the space charge region. Based on the theory of carrier number fluctuation and the model of surface recombination current, a 1/f noise model is developed. This model suggests that 1/f noise degradations are the result of the accumulation of oxide-trapped charges and interface states. Combining models of ELDRS, this model can explain the reason why the 1/f noise degradation is more severe at a low dose rate than at a high dose rate. The radiations were performed in a Co60 source up to a total dose of 700 Gy(Si). The low dose rate was 0.001 Gy(Si)/s and the high dose rate was 0.1 Gy(Si)/s. The model accords well with the experimental results. Project supported by the National Natural Science Foundation of China (Grant Nos. 61076101 and 61204092).

  1. An Evaluation of Bipolar Junction Transistors as Dosimeter for Megavoltage Electron Beams

    SciTech Connect

    Passos, Renan Garcia de; Vidal da Silva, Rogerio Matias; Silva, Malana Marcelina Almeida; Souza, Divanizia do Nascimento; Pereira dos Santos, Luiz Antonio

    2015-07-01

    Dosimetry is an extremely important field in medical applications of radiation and nowadays, electron beam is a good option for superficial tumor radiotherapy. Normally, the applied dose to the patient both in diagnostic and therapy must be monitored to prevent injuries and ensure the success of the treatment, therefore, we should always look for improving of the dosimetric methods. Accordingly, the aim of this work is about the use of a bipolar junction transistor (BJT) for electron beam dosimetry. After previous studies, such an electronic device can work as a dosimeter when submitted to ionizing radiation of photon beam. Actually, a typical BJT consists of two PN semiconductor junctions resulting in the NPN structure device, for while, and each semiconductor is named as collector (C), base (B) and emitter (E), respectively. Although the transistor effect, which corresponds to the current amplification, be accurately described by the quantum physics, one can utilize a simple concept from the circuit theory: the base current IB (input signal) is amplified by a factor of β resulting in the collector current IC (output signal) at least one hundred times greater the IB. In fact, the BJT is commonly used as a current amplifier with gain β=I{sub C}/I{sub B}, therefore, it was noticed that this parameter is altered when the device is exposed to ionizing radiation. The current gain alteration can be explained by the trap creation and the positive charges build up, beside the degradation of the lattice structure. Then, variations of the gain of irradiated transistors may justify their use as a dosimeter. Actually, the methodology is based on the measurements of the I{sub C} variations whereas I{sub B} is maintained constant. BC846 BJT type was used for dose monitoring from passive-mode measurements: evaluation of its electrical characteristic before and after irradiation procedure. Thus, IC readings were plotted as a function of the applied dose in 6 MeV electron beam

  2. Model of radiation-induced gain degradation of NPN bipolar junction transistor at different dose rates

    NASA Astrophysics Data System (ADS)

    Qifeng, Zhao; Yiqi, Zhuang; Junlin, Bao; Wei, Hu

    2015-06-01

    Ionizing-radiation-induced current gain degradation in NPN bipolar junction transistors is due to an increase in base current as a result of recombination at the surface of the device. A model is presented which identifies the physical mechanism responsible for current gain degradation. The increase in surface recombination velocity due to interface states results in an increase in base current. Besides, changing the surface potential along the base surface induced by the oxide-trapped charges can also lead to an increased base current. By combining the production mechanisms of oxide-trapped charges and interface states, this model can explain the fact that the current gain degradation is more severe at a low dose rate than at a high dose rate. The radiations were performed in a Co60 source up to a total dose of 70 krad(Si). The low dose rate was 0.1 rad(Si)/s and the high dose rate was 10 rad(Si)/s. The model accords well with the experimental results. Project supported by the National Natural Science Foundation of China (Nos. 61076101, 61204092).

  3. Effect of bias condition on heavy ion radiation in bipolar junction transistors

    NASA Astrophysics Data System (ADS)

    Liu, Chao-Ming; Li, Xing-Ji; Geng, Hong-Bin; Yang, De-Zhuang; He, Shi-Yu

    2012-08-01

    The characteristic degradations in a silicon NPN bipolar junction transistor (BJT) of 3DG142 type are examined under irradiation with 40-MeV chlorine (Cl) ions under forward, grounded, and reverse bias conditions, respectively. Different electrical parameters are in-situ measured during the exposure under each bias condition. From the experimental data, a larger variation of base current (IB) is observed after irradiation at a given value of base-emitter voltage (VBE), while the collector current is slightly affected by irradiation at a given VBE. The gain degradation is affected mostly by the behaviour of the base current. From the experimental data, the variation of current gain in the case of forward bias is much smaller than that in the other conditions. Moreover, for 3DG142 BJT, the current gain degradation in the case of reverse bias is more severe than that in the grounded case at low fluence, while at high fluence, the gain degradation in the reverse bias case becomes smaller than that in the grounded case.

  4. DLTS Studies of bias dependence of defects in silicon NPN bipolar junction transistor irradiated by heavy ions

    NASA Astrophysics Data System (ADS)

    Liu, Chaoming; Li, Xingji; Geng, Hongbin; Rui, Erming; Yang, Jianqun; Xiao, Liyi

    2012-10-01

    The characteristic degradation in silicon NPN bipolar junction transistors (BJTs) of 3DG130 type is examined under the irradiation with 35 MeV silicon (Si) ions under forward, grounded and reverse bias conditions, respectively. Different electrical parameters were in-situ measured during the exposure under each bias condition. Using deep level transient spectroscopy (DLTS), deep level defects in the base-collector junction of 3DG130 transistors under various bias conditions are measured after irradiation. The activation energy, capture cross section and concentration of observed deep level defects are measured using DLTS technique. Based on the in situ electrical measurement and DLTS spectra, it is clearly that the bias conditions could affect the concentration of deep level defects, and the displacement damage induced by heavy ions.

  5. Voltage regulator for battery power source. [using a bipolar transistor

    NASA Technical Reports Server (NTRS)

    Black, J. M. (Inventor)

    1979-01-01

    A bipolar transistor in series with the battery as the control element also in series with a zener diode and a resistor is used to maintain a predetermined voltage until the battery voltage decays to very nearly the predetermined voltage. A field effect transistor between the base of the bipolar transistor and a junction between the zener diode and resistor regulates base current of the bipolar transistor, thereby regulating the conductivity of the bipolar transistor for control of the output voltage.

  6. Bipolar Transistor Based on Graphane

    NASA Astrophysics Data System (ADS)

    Gharekhanlou, B.; Tousaki, S. B.; Khorasani, S.

    2010-11-01

    Graphane is a semiconductor with an energy gap, obtained from hydrogenation of the two-dimensional grapheme sheet. Together with the two-dimensional geometry, unique transport features of graphene, and possibility of doping graphane, p and n regions can be defined so that p-n junctions become feasible with small reverse currents. Our recent analysis has shown that an ideal I-V characteristic for this type of junctions may be expected. Here, we predict the behavior of bipolar juncrion transistors based on graphane. Profiles of carriers and intrinsic parameters of the graphane transistor are calculated and discussed.

  7. Gate voltage dependent characteristics of p-n diodes and bipolar transistors based on multiwall CN(x)/carbon nanotube intramolecular junctions.

    PubMed

    Zhang, W J; Zhang, Q F; Chai, Y; Shen, X; Wu, J L

    2007-10-03

    The electrical transport characteristics of multiwall CN(x)/carbon nanotube intramolecular junctions were studied. The junctions could be used as diodes. We found that the rectification resulted from p-n junctions, not from metal-semiconductor junctions. The gate effect was very weak when the diodes were reverse biased. At forward bias, however, some of the p-n diodes could be n-type transistors. Experimental results supported the opinion that the gate voltage dependent property is derived from the Schottky barrier between the CN(x) part and the electrode. Using p-n diodes, a bipolar transistor with nanoscale components was built, whose behavior was very similar to that of a conventional planar bipolar transistor.

  8. Effect of parasitic series resistances and spurious currents on the extracted temperature of a bipolar junction transistor.

    PubMed

    Mimila-Arroyo, J

    2013-12-01

    Verster's proposition to directly extract the temperature of a bipolar junction transistor using its collector current is widely used. However, the resulting temperature is low accurate even when calibrated. Here, it is demonstrated that the misuse of the emitter current instead of the collector one, because of the presence of spurious currents other than the injection-diffusion one and transistor parasitic series resistances both contribute to the observed inaccuracy. Particularly parasitic series resistances increase the inaccuracy and introduce a strong dependence of the extracted temperature on the collector currents used to extract the temperature; the higher those resistances the higher the inaccuracy. A proposition is made to reduce the effect of those resistances on the inaccuracy of this thermometric element, which allows obtaining a more accurate value on a wider range of the collector probe currents.

  9. DLTS study of deep level defects in Li-ion irradiated bipolar junction transistor

    NASA Astrophysics Data System (ADS)

    Madhu, K. V.; Kulkarni, S. R.; Ravindra, M.; Damle, R.

    2007-01-01

    Commercial npn transistor (2N 2219A) irradiated with 50 MeV Li 3+-ions with fluences ranging from 3.1 × 10 13 ions cm -2 to 12.5 × 10 13 ions cm -2, is studied for radiation induced gain degradation and minority carrier trap levels or recombination centers. The properties such as activation energy, trap concentration and capture cross section of induced deep levels are studied by deep level transient spectroscopy (DLTS) technique. Minority carrier trap levels with energies ranging from 0.237 eV to 0.591 eV were observed in the base-collector junction of the transistor. In situ I- V measurements were made to study the gain degradation as a function of ion fluence. Ion induced energy levels result in increase in the base current through Shockley Read Hall (SRH) or multi-phonon recombination and subsequent transistor gain degradation.

  10. Evaluation of Enhanced Low Dose Rate Sensitivity in Discrete Bipolar Junction Transistors

    NASA Technical Reports Server (NTRS)

    Chen, Dakai; Ladbury Raymond; LaBel, Kenneth; Topper, Alyson; Ladbury, Raymond; Triggs, Brian; Kazmakites, Tony

    2012-01-01

    We evaluate the low dose rate sensitivity in several families of discrete bipolar transistors across device parameter, quality assurance level, and irradiation bias configuration. The 2N2222 showed the most significant low dose rate sensitivity, with low dose rate enhancement factor of 3.91 after 100 krad(Si). The 2N2907 also showed critical degradation levels. The devices irradiated at 10 mrad(Si)/s exceeded specifications after 40 and 50 krad(Si) for the 2N2222 and 2N2907 devices, respectively.

  11. Annealing effects and DLTS study on PNP silicon bipolar junction transistors irradiated by 20 MeV Br ions

    NASA Astrophysics Data System (ADS)

    Liu, Chaoming; Li, Xingji; Yang, Jianqun; Bollmann, Joachim

    2014-01-01

    Isochronal anneal sequences have been carried out on 3CG130 silicon PNP bipolar junction transistors (BJTs) irradiated with 20 MeV bromine (Br) heavy ions. The Gummel curve was utilized to characterize the annealing behavior of defects in both the emitter-base depletion region and the neutral base. The results show that the base current (IB) decreases with the increasing annealing temperature, while the collector current (IC) keeps invariably. The current gain varies slightly, when the annealing temperature (TA) is lower than 500 K, while varies rapidly at TA>550 K, and the current gain of the 3CG130 BJT annealing at 700 K almost restore to that of the pre-radiation transistor. The deep level transient spectroscopy (DLTS) data was used to assign the relative magnitude of each of the important defects. Based on the in situ electrical measurement and DLTS spectra, it is clear that the V2(+/0) trap is the main contribution to the degradation of current gain after the 20 MeV Br ions irradiation. The V2(+/0) peak has many characteristics expected for the current gain degradation.

  12. MOSFET-BJT hybrid mode of the gated lateral bipolar junction transistor for C-reactive protein detection.

    PubMed

    Yuan, Heng; Kwon, Hyurk-Choon; Yeom, Se-Hyuk; Kwon, Dae-Hyuk; Kang, Shin-Won

    2011-10-15

    In this study, we propose a novel biosensor based on a gated lateral bipolar junction transistor (BJT) for biomaterial detection. The gated lateral BJT can function as both a BJT and a metal-oxide-semiconductor field-effect transistor (MOSFET) with both the emitter and source, and the collector and drain, coupled. C-reactive protein (CRP), which is an important disease marker in clinical examinations, can be detected using the proposed device. In the MOSFET-BJT hybrid mode, the sensitivity, selectivity, and reproducibility of the gated lateral BJT for biosensors were evaluated in this study. According to the results, in the MOSFET-BJT hybrid mode, the gated lateral BJT shows good selectivity and reproducibility. Changes in the emitter (source) current of the device for CRP antigen detection were approximately 0.65, 0.72, and 0.80 μA/decade at base currents of -50, -30, and -10 μA, respectively. The proposed device has significant application in the detection of certain biomaterials that require a dilution process using a common biosensor, such as a MOSFET-based biosensor.

  13. Switching Characteristics of a 4H-SiC Based Bipolar Junction Transistor to 200 C

    NASA Technical Reports Server (NTRS)

    Niedra, Janis M.

    2006-01-01

    Static curves and resistive load switching characteristics of a 600 V, 4 A rated, SiC-based NPN bipolar power transistor (BJT) were observed at selected temperatures from room to 200 C. All testing was done in a pulse mode at low duty cycle (approx.0.1 percent). Turn-on was driven by an adjustable base current pulse and turn-off was accelerated by a negative base voltage pulse of 7 V. These base drive signals were implemented by 850 V, gated power pulsers, having rise-times of roughly 10 ns, or less. Base charge sweep-out with a 7 V negative pulse did not produce the large reverse base current pulse seen in a comparably rated Si-based BJT. This may be due to a very low charge storage time. The decay of the collector current was more linear than its exponential-like rise. Switching observations were done at base drive currents (I(sub B)) up to 400 mA and collector currents (I(sub C)) up to 4 A, using a 100 Omega non-inductive load. At I(sub B) = 400 mA and I(sub C) = 4 A, turn-on times typically varied from 80 to 94 ns, over temperatures from 23 to 200 C. As expected, lowering the base drive greatly extended the turn-on time. Similarly, decreasing the load current to I(sub C) = 1 A with I(sub B) = 400 mA produced turn-on times as short as 34 ns. Over the 23 to 200 C range, with I(sub B) = 400 mA and I(sub C) = 4 A, turn-off times were in the range of 72 to 84 ns with the 7 V sweep-out.

  14. Simulation of energy and fluence dependence of heavy ion induced displacement damage factor in bipolar junction transistor

    NASA Astrophysics Data System (ADS)

    Kulkarni, S. R.; Ravindra, M.; Joshi, G. R.; Damle, R.

    2004-05-01

    This article presents the theoretical calculation of the variation of displacement damage factors as a function of energy and rad equivalent fluence in bipolar junction transistor for various particulate radiation viz ., He, Si, Cl, Ti, Ni, Br, Ag, I, and Au. The calculation is based on the experimental data on gamma-ray induced gain degradation in a commercial space borne BJT (2N3019). The method involves the calculation of gamma-ray dose (rad(Si)) equivalent of effective particle fluence. The linear energy transfer (LET) in silicon for different particle radiation obtained from TRIM calculation has been used for the conversion of gamma-dose into fluence of various particles. The estimation predicts a smooth increase in the displacement damage factor as the mass of the ion increases. Further, the displacement damage factor reaches a maximum at the same value of energy, which corresponds to maximum LET for all heavy ions. The maximum value of damage factor marginally decreases with increasing ion fluence for an ion of given energy. The results are compared with the data available in the literature for proton, deuteron, and helium induced displacement damage.

  15. I-V and DLTS study of generation and annihilation of deep-level defects in an oxygen-ion irradiated bipolar junction transistor

    NASA Astrophysics Data System (ADS)

    Madhu, K. V.; Kulkarni, S. R.; Ravindra, M.; Damle, R.

    A commercial bipolar junction transistor (2N 2219A, npn) irradiated with 84 MeV O6+-ions with fluence of the order of 1013 ions cm-2 is studied for radiation-induced gain degradation and deep-level defects or recombination centers. I-V measurements are made to study the gain degradation as a function of ion fluence. Properties such as activation energy, trap concentration and capture cross section of deep levels are studied by deep-level transient spectroscopy. Minority carrier trap energy levels with energies ranging from EC -0.17 eV to EC -0.55 eV are observed in the base-collector junction of the transistor. Majority carrier defect levels are also observed with energies ranging from EV +0.26 eV to EV +0.44 eV. The irradiated device is subjected to isothermal and isochronal annealing. The defects are seen to anneal above 250 °C. The defects generated in the base region of the transistor by displacement damage appear to be responsible for an increase in base current through Shockley-Read-Hall or multi-phonon recombination and consequent transistor gain degradation.

  16. The comparison of radiation hardness of heterojunction SiGe and conventional silicon bipolar transistors

    NASA Astrophysics Data System (ADS)

    Bakerenkov, A. S.; Felitsyn, V. A.; Rodin, A. S.

    2016-10-01

    The results of the X-ray radiation impact on heterojunction SiGe and conventional silicon bipolar transistors are presented. Oxide thickness over the emitter-base junction depletion region determines the radiation hardness of the bipolar transistors. In this article, the estimation of the rate of radiation degradation of electrical parameters for conventional silicon devices and SiGe-transistors is performed.

  17. Effects of base doping and carrier lifetime on differential current gain and temperature coefficient of 4H-SiC power bipolar junction transistors

    NASA Astrophysics Data System (ADS)

    Niu, X.; Fardi, H.

    2012-04-01

    4H-SiC NPN bipolar junction transistor (BJT) is studied systematically by performing two-dimensional numerical simulations. Several design issues are discussed. Depending on the doping concentration of the base and the carrier lifetimes, both positive and negative temperature coefficients in the common emitter current gain could exist in 4H-SiC NPN BJTs with aluminium-doped base. The temperature coefficients of the current gain at different base doping concentrations and different carrier lifetimes have been determined. A high base doping concentration can reduce the requirement for the carrier lifetime in order to obtain negative temperature coefficient in current gain. Device simulations are performed to evaluate the carrier lifetimes by fitting the measured output IC -VCE curves. An excellent fitting is obtained and the base electron lifetime and the emitter hole lifetime are extracted to be about 22 and 5.7 ns, respectively.

  18. High power gain switched laser diodes using a novel compact picosecond switch based on a GaAs bipolar junction transistor structure for pumping

    NASA Astrophysics Data System (ADS)

    Vainshtein, Sergey; Kostamovaara, Juha

    2006-04-01

    A number of up-to-date applications, including advanced optical radars with high single-shot resolution, precise 3 D imaging, laser tomography, time imaging spectroscopy, etc., require low-cost, compact, reliable sources enabling the generation of high-power (1-100 W) single optical pulses in the picosecond range. The well-known technique of using the gain-switching operation mode of laser diodes to generate single picosecond pulses in the mW range fails to generate high-power single picosecond pulses because of a lack of high-current switches operating in the picosecond range. We report here on the achieving of optical pulses of 45W / 70ps, or alternatively 5W / 40ps, with gain-switched commercial quantum well (QW) laser diodes having emitting areas of 250 × 200 μm and 75 × 2 μm, respectively. This was made possible by the use of a novel high-current avalanche switch based on a GaAs bipolar junction transistor (BJT) structure with a switching time (<200ps) comparable to the lasing delay. (The extremely fast transient in this switch is caused by the generation and spread of a comb of powerfully avalanching Gunn domains of ultra-high amplitude in the transistor structure.) A simulation code developed earlier but modified and carefully verified here allowed detailed comparison of the experimental and simulated laser responses and the transient spectrum.

  19. Influence of the emitter-base junction depth on the low frequency noise of Si/SiGeC heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Benoit, Patrice; Chay, Cyril; Delseny, Colette; Pascal, Fabien; Llinares, Pierre; Vildeuil, Jean-Charles; Baudry, Helene

    2004-05-01

    This work presents low frequency noise results in high-speed Si/SiGeC heterojunction bipolar transistors (HBTs). In this new generation of HBTs carbon doping is processed during of the deposit of the epitaxial SiGe base layer in order to suppress boron out-diffusion. Low frequency noise study is performed on three type of transistors that differ by the thickness of the Si cap layer. The Si Cap layer is a non intentional doped Si layer deposit after the SiGeC base layer and prior the contact emitter structure. Thus, the results on the three different Si Cap HBTs allow us to study the influence of the Emitter-Base junction depth on the low frequency noise of these HBTs. Measurements of the equivalent input noise spectral density (SiB) showed that spectra are composed of a 1/f component and the white noise is always reached at low bias. For the smallest transistors we observed the presence of Lorentzian(s) component(s). The excess noise sources are mainly located at the intrinsic emitter-base junction. Concerning the 1/f noise level, a quadratic dependence on base current bias and an inverse dependence on the emitter area are found. The normalized figure of merit, Kb = KfxAE, is ranging between 1.7 and 2.1 10-9 μm2 and is among the best results published concerning SiGe HBTs, this shows that the incorporation of carbon do not have any consequence for the 1/f noise level and more generally for the LF noise characteristics. In the Si Cap thickness range used in this work, no noise degradation is observed when the electrical emitter-base junction is getting closer to the poly/mono emitter interface. Hence DC and AC characteristics could be optimized without changing the LF noise performances. Finally, from measurements at the input and at the output, the emitter series resistance is extracted and is found to be proportional to the Si Cap thickness.

  20. Distinctive Features of the Temperature Sensitivity of a Transistor Structure in a Bipolar Mode of Measurement

    NASA Astrophysics Data System (ADS)

    Karimov, A. V.; Dzhuraev, D. P.; Kuliev, Sh. M.; Turaev, A. A.

    2016-03-01

    Results are presented of an experimental investigation of the temperature sensitivity of an individual base-to-collector junction of a bipolar transistor structure and of this same structure in the case of series connection of blocking emitter and collector junctions. It is shown that the temperature-sensitivity coefficient of the transistor structure operating in a bipolar mode of measurement is an order of magnitude larger than an analogous coefficient of the base-to-collector junction.

  1. Nanofluidic diode and bipolar transistor.

    PubMed

    Daiguji, Hirofumi; Oka, Yukiko; Shirono, Katsuhiro

    2005-11-01

    Theoretical modeling of ionic distribution and transport in a nanochannel containing a surface charge on its wall, 30 nm high and 5 microm long, suggests that ionic current can be controlled by locally modifying the surface charge density through a gate electrode, even if the electrical double layers are not overlapped. When the surface charge densities at the right and left halves of a channel are the same absolute value but of different signs, this could form the basis of a nanofluidic diode. When the surface charge density at the middle part of a channel is modified, this could form the basis of a nanofluidic bipolar transistor.

  2. Probing plasma-surface interactions with the transmission electron microscope or the Si-collector interface of the plasma bipolar junction transistor

    NASA Astrophysics Data System (ADS)

    Houlahan, T. J., Jr.; Li, B.; Xu, Z.; Jiang, J.; Liu, G. L.; Ruzic, D. N.; Eden, J. G.

    2013-11-01

    Two platforms developed to probe the plasma-solid interface are briefly reviewed here. A sensitive diagnostic of the interaction between a low-temperature plasma and a silicon surface is provided by the plasma bipolar junction transistor (PBJT) in which e--h+ (semiconductor) and e--ion (gas phase) plasmas are separated by a nanoscale potential barrier but coupled by a strong (>1 V µm-1) electric field. Electrical properties of the Si base-collector plasma interface are controlled by the bias applied to the PBJT emitter-base junction, as well as the morphology and electronic structure of the base surface facing the collector plasma. Recent experiments are described in which the Si(100) surface of the PBJT base is transformed into black Si, a nanostructured array comprising ˜3 × 109 nanocones. Each cone is ˜100 nm in height and has a radius of curvature at its tip of <1 nm. Altering the base surface so as to intentionally enhance field emission results in burst-mode operation of the PBJT in which the collector current oscillates as a result of the periodic contraction (or collapse) and revival of the plasma sheath. The observed oscillation frequencies (3.6-13 kHz) are consistent with the transit time of ions across the sheath. Integration of a microplasma device with a transmission electron microscope has also been realized recently (Tai et al 2013 Sci. Rep. 3 1325). This diagnostic tool allows plasma-surface interactions to be observed in real-time with a spatial resolution <100 nm. Although initial experiments concerned the growth of Au islands in a dc plasma, the extension of this probe to nanostructured and spatially modulated surfaces is proposed.

  3. Bipolar transistor in VESTIC technology: prototype

    NASA Astrophysics Data System (ADS)

    Mierzwiński, Piotr; Kuźmicz, Wiesław; Domański, Krzysztof; Tomaszewski, Daniel; Głuszko, Grzegorz

    2016-12-01

    VESTIC technology is an alternative for traditional CMOS technology. This paper presents first measurement data of prototypes of VES-BJT: bipolar transistors in VESTIC technology. The VES-BJT is a bipolar transistor on the SOI substrate with symmetric lateral structure and both emitter and collector made of polysilicon. The results indicate that VES-BJT can be a device with useful characteristics. Therefore, VESTIC technology has the potential to become a new BiCMOS-type technology with some unique properties.

  4. A New Self-Heating Bipolar Transistor Spice Model

    NASA Astrophysics Data System (ADS)

    Pintacuda, Francesco; Cavallaro, Daniela; Bazzano, Gaetano

    2011-10-01

    Self-heating effects in Bipolar Junction Transistors have been incorporated into SPICE through sub-circuits including a thermal model. It contains a dynamic link between electrical and thermal components which allows a good prediction of DC and AC variation due to temperature in the range of the component (-55 C to 150C). It allows the estimation of the junction-temperature when the device is working in the power application. An example of thermal transient simulation is presented showing the thermal effects in a typical circuit configuration.

  5. Self-oscillating inverter with bipolar transistors

    NASA Astrophysics Data System (ADS)

    Baciu, I.; Cunţan, C. D.; Floruţa, M.

    2016-02-01

    The paper presents a self-oscillating inverter manufactured with bipolar transistors that supplies a high-amplitude alternating voltage to a fluorescent tube with a burned filament. The inverter is supplied from a low voltage accumulator that can be charged from a photovoltaic panel through a voltage regulator.

  6. Radiation Damage In Advanced Bipolar Transistors

    NASA Technical Reports Server (NTRS)

    Zoutendyk, John A.; Goben, Charles A.; Berndt, Dale F.

    1989-01-01

    Report describes measurements of common-emitter current gains (hFE) of advanced bipolar silicon transistors before, during, and after irradiation with 275-MeV bromine ions, 2.5-MeV electrons, and conductivity rays from cobalt-60 atoms.

  7. Complementary junction heterostructure field-effect transistor

    DOEpatents

    Baca, A.G.; Drummond, T.J.; Robertson, P.J.; Zipperian, T.E.

    1995-12-26

    A complimentary pair of compound semiconductor junction heterostructure field-effect transistors and a method for their manufacture are disclosed. The p-channel junction heterostructure field-effect transistor uses a strained layer to split the degeneracy of the valence band for a greatly improved hole mobility and speed. The n-channel device is formed by a compatible process after removing the strained layer. In this manner, both types of transistors may be independently optimized. Ion implantation is used to form the transistor active and isolation regions for both types of complimentary devices. The invention has uses for the development of low power, high-speed digital integrated circuits. 10 figs.

  8. Complementary junction heterostructure field-effect transistor

    DOEpatents

    Baca, Albert G.; Drummond, Timothy J.; Robertson, Perry J.; Zipperian, Thomas E.

    1995-01-01

    A complimentary pair of compound semiconductor junction heterostructure field-effect transistors and a method for their manufacture are disclosed. The p-channel junction heterostructure field-effect transistor uses a strained layer to split the degeneracy of the valence band for a greatly improved hole mobility and speed. The n-channel device is formed by a compatible process after removing the strained layer. In this manner, both types of transistors may be independently optimized. Ion implantation is used to form the transistor active and isolation regions for both types of complimentary devices. The invention has uses for the development of low power, high-speed digital integrated circuits.

  9. Bipolar-FET combinational power transistors for power conversion applications

    NASA Technical Reports Server (NTRS)

    Chen, D. Y.; Chin, S. A.

    1984-01-01

    Four bipolar-FET (field-effect transistor) combinational transistor configurations are compared from the application point of view. The configurations included are FET-Darlington (cascade), emitter-open switch (cascode), parallel configuration, and FET-gated bipolar transistors (FGT).

  10. Total Dose Effects in Conventional Bipolar Transistors

    NASA Technical Reports Server (NTRS)

    Johnston, A. H.; Swift, G. W.; Rax, B. G.

    1994-01-01

    This paper examines various factors in bipolar device construction and design, and discusses their impact on radiation hardness. The intent of the paper is to improve understanding of the underlying mechanisms for practical devices without special test structures, and to provide (1) guidance in ways to select transistor designs that are more resistant to radiation damage, and (2) methods to estimate the maximum amount of damage that might be expected from a basic transistor design. The latter factor is extremely important in assessing the risk that future lots of devices will be substantially below design limits, which are usually based on test data for older devices.

  11. Design and fabrication of gallium nitride-based heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Lee, Kyu-Pil

    A self-aligned fabrication process for small and large emitter contact area (2 x 4 mum2 and 1.96 x 103 mum 2 respectively) GaN-based heterojunction bipolar transistor and bipolar junction transistors is proposed. The process features dielectric-spacer sidewalls, low-damage dry etching and selected-area regrowth of GaAs(C) on the base contact, and self-aligned emitter base regrowth processes are provided. The junction current-voltage (I--V) characteristics were evaluated at various stages of the process sequence and provided an excellent diagnostic for monitoring the effect of plasma processes such as CVD or etching. A comparison is given with large emitter-area devices fabricated on the same material. The small-area devices are attractive for microwave power switching applications, provided that a high-yield process can be developed. Series resistance effects are still found to influence device performance. In the dc performance of small and large emitter contact area GaN-based heterojunction bipolar transistors, the do current gain of both types of device improves with temperature, which we ascribe to higher ionization efficiency of the Mg acceptor in the p-base region. The presence of a resistive base layer at room temperature forces base current to flow directly to the collector, reducing the current gain. However, to date, all of the reported GaN-based heterojunction bipolar transistors (HBTs) and bipolar junction transistors (BJTs) have had lots of problems to be solved even if there are many advantages to this technology. To predict the performance of GaN-based HBTs and BJTs, we simulated these structures with 2-dimensional device simulators. The effects of base doping and thickness on do current gain, collector-emitter saturation voltage, saturation current, collector-emitter breakdown voltage, rf characteristics (fT) and the effects of impurity ionization as a function of device operation temperature of GaN, AlGaN, InGaN-based heterojunction bipolar

  12. Dose Rate Effects in Linear Bipolar Transistors

    NASA Technical Reports Server (NTRS)

    Johnston, Allan; Swimm, Randall; Harris, R. D.; Thorbourn, Dennis

    2011-01-01

    Dose rate effects are examined in linear bipolar transistors at high and low dose rates. At high dose rates, approximately 50% of the damage anneals at room temperature, even though these devices exhibit enhanced damage at low dose rate. The unexpected recovery of a significant fraction of the damage after tests at high dose rate requires changes in existing test standards. Tests at low temperature with a one-second radiation pulse width show that damage continues to increase for more than 3000 seconds afterward, consistent with predictions of the CTRW model for oxides with a thickness of 700 nm.

  13. Perpendicular transport in superlattice bipolar transistors (SBT)

    NASA Astrophysics Data System (ADS)

    Sibille, A.; Palmier, J. F.; Minot, C.; Harmand, J. C.; Dubon-Chevallier, C.

    Diffusion-limited electron transport in superlattices is studied by gain measurements on heterojunction bipolar transistors with a {GaAs}/{GaAlAs} superlattice base. In the case of thin barriers, Bloch conduction is observed, while hopping between localized levels prevails for large barriers. A transition occurs between these two regimes, localization being achieved when the energy broadening induced by the electron-phonon coupling added to the disorder due to imperfect growth is of the order of the miniband width. This interpretation is supported by temperature dependence measurements of the perpendicular mobilities in relation with theoretical calculations of these mobilities.

  14. Gallium nitride junction field-effect transistor

    DOEpatents

    Zolper, John C.; Shul, Randy J.

    1999-01-01

    An all-ion implanted gallium-nitride (GaN) junction field-effect transistor (JFET) and method of making the same. Also disclosed are various ion implants, both n- and p-type, together with or without phosphorous co-implantation, in selected III-V semiconductor materials.

  15. Gallium nitride junction field-effect transistor

    DOEpatents

    Zolper, J.C.; Shul, R.J.

    1999-02-02

    An ion implanted gallium-nitride (GaN) junction field-effect transistor (JFET) and method of making the same are disclosed. Also disclosed are various ion implants, both n- and p-type, together with or without phosphorus co-implantation, in selected III-V semiconductor materials. 19 figs.

  16. Hardening measures for bipolar transistors against microwave-induced damage

    NASA Astrophysics Data System (ADS)

    Chai, Chang-Chun; Ma, Zhen-Yang; Ren, Xing-Rong; Yang, Yin-Tang; Zhao, Ying-Bo; Yu, Xin-Hai

    2013-06-01

    In the present paper we study the influences of the bias voltage and the external components on the damage progress of a bipolar transistor induced by high-power microwaves. The mechanism is presented by analyzing the variation in the internal distribution of the temperature in the device. The findings show that the device becomes less vulnerable to damage with an increase in bias voltage. Both the series diode at the base and the relatively low series resistance at the emitter, Re, can obviously prolong the burnout time of the device. However, Re will aid damage to the device when the value is sufficiently high due to the fact that the highest hot spot shifts from the base-emitter junction to the base region. Moreover, the series resistance at the base Rb will weaken the capability of the device to withstand microwave damage.

  17. Review of Heterojunctin Bipolar Transistor Structure, Applications, and Reliability

    NASA Technical Reports Server (NTRS)

    Lee, C.; Kayali, S.

    1993-01-01

    Heterojunction Bipolar Transistors (HBTs) are increasingly employed in high frequency, high linerity, and high efficiency applications. As the utilization of these devices becomes more widespread, their operation will be viewed with more scrutiny.

  18. Experimental Analysis of Proton-Induced Displacement and Ionization Damage Using Gate-Controlled Lateral PNP Bipolar Transistors

    NASA Technical Reports Server (NTRS)

    Ball, D. R.; Schrimpf, R. D.; Barnaby, H. J.

    2006-01-01

    The electrical characteristics of proton-irradiated bipolar transistors are affected by ionization damage to the insulating oxide and displacement damage to the semiconductor bulk. While both types of damage degrade the transistor, it is important to understand the mechanisms individually and to be able to analyze them separately. In this paper, a method for analyzing the effects of ionization and displacement damage using gate-controlled lateral PNP bipolar junction transistors is described. This technique allows the effects of oxide charge, surface recombination velocity, and bulk traps to be measured independently.

  19. Graphene junction field-effect transistor

    NASA Astrophysics Data System (ADS)

    Ou, Tzu-Min; Borsa, Tomoko; van Zeghbroeck, Bart

    2014-03-01

    We have demonstrated for the first time a novel graphene transistor gated by a graphene/semiconductor junction rather than an insulating gate. The transistor operates much like a semiconductor junction Field Effect Transistor (jFET) where the depletion layer charge in the semiconductor modulates the mobile charge in the channel. The channel in our case is the graphene rather than another semiconductor layer. An increased reverse bias of the graphene/n-silicon junction increases the positive charge in the depletion region and thereby reduces the total charge in the graphene. We fabricated individual graphene/silicon junctions as well as graphene jFETs (GjFETs) on n-type (4.5x1015 cm-3) silicon with Cr/Au electrodes and 3 μm gate length. As a control device, we also fabricated back-gated graphene MOSFETs using a 90nm SiO2 on a p-type silicon substrate (1019 cm-3) . The graphene was grown by APCVD on copper foil and transferred with PMMA onto the silicon substrate. The GjFET exhibited an on-off ratio of 3.75, an intrinsic graphene doping of 1.75x1012 cm-2, compared to 1.17x1013 cm-2 in the MOSFET, and reached the Dirac point at 13.5V. Characteristics of the junctions and transistors were measured as a function of temperature and in response to light. Experimental data and a comparison with simulations will be presented.

  20. N p n bipolar-junction-transistor detector with integrated p n p biasing transistor—feasibility study, design and first experimental results

    NASA Astrophysics Data System (ADS)

    Verzellesi, Giovanni; Bergamini, Davide; Dalla Betta, Gian-Franco; Piemonte, Claudio; Boscardin, Maurizio; Bosisio, Luciano; Bettarini, Stefano; Batignani, Giovanni

    2006-02-01

    We propose a novel n-p-n BJT radiation detector on high-resistivity silicon with integrated p-n-p transistor providing the quiescent base current of the detector. The dc operational limits of the proposed detector are analysed by means of numerical device simulations, pointing out that, by properly distancing the base of the p-n-p transistor from the emitter of the n-p-n detector, the latch-up of the parasitic thyristor embedded within the detector-plus-biasing-transistor structure takes place at relatively high current levels, where detector operation should anyway be avoided in order to prevent the associated current-gain loss. Numerical simulations provides insight about the bias dependence of charge-collection waveforms, indicating that minimization of the collecting time requires the detector quiescent current to be adjusted at the highest value still allowing high-injection effects to be avoided. A small-signal equivalent circuit of the proposed structure is also derived, allowing the impact of p-n-p biasing transistor and load resistance on the charge-collecting time constant to be evaluated. First experimental results show that fabricated structures are immune from the latch-up of the parasitic thyristor throughout their high-current-gain operating region and feature a minimum charge-collecting time constant of 35 µs, as tested by pulsed laser illumination.

  1. Advanced insulated gate bipolar transistor gate drive

    DOEpatents

    Short, James Evans; West, Shawn Michael; Fabean, Robert J.

    2009-08-04

    A gate drive for an insulated gate bipolar transistor (IGBT) includes a control and protection module coupled to a collector terminal of the IGBT, an optical communications module coupled to the control and protection module, a power supply module coupled to the control and protection module and an output power stage module with inputs coupled to the power supply module and the control and protection module, and outputs coupled to a gate terminal and an emitter terminal of the IGBT. The optical communications module is configured to send control signals to the control and protection module. The power supply module is configured to distribute inputted power to the control and protection module. The control and protection module outputs on/off, soft turn-off and/or soft turn-on signals to the output power stage module, which, in turn, supplies a current based on the signal(s) from the control and protection module for charging or discharging an input capacitance of the IGBT.

  2. Npn double heterostructure bipolar transistor with ingaasn base region

    DOEpatents

    Chang, Ping-Chih; Baca, Albert G.; Li, Nein-Yi; Hou, Hong Q.; Ashby, Carol I. H.

    2004-07-20

    An NPN double heterostructure bipolar transistor (DHBT) is disclosed with a base region comprising a layer of p-type-doped indium gallium arsenide nitride (InGaAsN) sandwiched between n-type-doped collector and emitter regions. The use of InGaAsN for the base region lowers the transistor turn-on voltage, V.sub.on, thereby reducing power dissipation within the device. The NPN transistor, which has applications for forming low-power electronic circuitry, is formed on a gallium arsenide (GaAs) substrate and can be fabricated at commercial GaAs foundries. Methods for fabricating the NPN transistor are also disclosed.

  3. Observation of negative differential transconductance in tunneling emitter bipolar transistors

    NASA Astrophysics Data System (ADS)

    van Veenhuizen, Marc J.; Locatelli, Nicolas; Moodera, Jagadeesh; Chang, Joonyeon

    2009-08-01

    We report on measurement of negative differential transconductance (NDTC) of iron (Fe)/magnesium-oxide (MgO)/silicon tunneling emitter NPN bipolar transistors. Device simulations reveal that the NDTC is a consequence of an inversion layer at the tunneling-oxide/P-silicon interface for low base voltages. Electrons travel laterally through the inversion layer into the base and give rise to an increase in collector current. The NDTC results from the recombination of those electrons at the interface between emitter and base contact which is dependent on the base voltage. For larger base voltages, the inversion layer disappears marking the onset of normal bipolar transistor behavior.

  4. Heterojunction bipolar transistor technology for data acquisition and communication

    NASA Technical Reports Server (NTRS)

    Wang, C.; Chang, M.; Beccue, S.; Nubling, R.; Zampardi, P.; Sheng, N.; Pierson, R.

    1992-01-01

    Heterojunction Bipolar Transistor (HBT) technology has emerged as one of the most promising technologies for ultrahigh-speed integrated circuits. HBT circuits for digital and analog applications, data conversion, and power amplification have been realized, with speed performance well above 20 GHz. At Rockwell, a baseline AlGaAs/GaAs HBT technology has been established in a manufacturing facility. This paper describes the HBT technology, transistor characteristics, and HBT circuits for data acquisition and communication.

  5. Early effect of SiGe heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Xu, Xiao-Bo; Zhang, He-Ming; Hu, Hui-Yong; Qu, Jiang-Tao

    2012-06-01

    The standard Early voltage of the SGP model is generalized for SiGe NPN heterojunction bipolar transistors (HBTs). A new compact formulation of the Early voltage compatible with the SGP model is presented. The impact of the Ge profile on Early effect is shown and validated by experiments. The model can be applied to the SGP model for circuit simulation.

  6. Bipolar Transistors Can Detect Charge in Electrostatic Experiments

    ERIC Educational Resources Information Center

    Dvorak, L.

    2012-01-01

    A simple charge indicator with bipolar transistors is described that can be used in various electrostatic experiments. Its behaviour enables us to elucidate links between 'static electricity' and electric currents. In addition it allows us to relate the sign of static charges to the sign of the terminals of an ordinary battery. (Contains 7 figures…

  7. Modeling of the bipolar transistor under different pulse ionizing radiations

    NASA Astrophysics Data System (ADS)

    Antonova, A. M.; Skorobogatov, P. K.

    2017-01-01

    This paper describes a 2D model of the bipolar transistor 2T312 under gamma, X-ray and laser pulse ionizing radiations. Both the Finite Element Discretization and Semiconductor module of Comsol 5.1 are used. There is an analysis of energy deposition in this device under different radiations and the results of transient ionizing current response for some different conditions.

  8. Characterization and modeling of the power Insulated Gate Bipolar Transistor

    SciTech Connect

    Hefner, A.R.

    1987-01-01

    The power Insulated Gate Bipolar Transistor (IGBT) is a new switching device designed to overcome the high on-state loss of the power MOSFET. The IGBT behaves as a bipolar transistor which is supplied base current by a MOSFET. The bipolar transistor of the IBGT has a wide base with the base contact at the collector edge of the base and is operated with its base in high-level injection. Because of this, the traditional bipolar transistor models are not adequate for the IBGT and the new model developed in this dissertation must be used. The new model is developed using ambipolar transport and does not assume the quasi-static condition for the transient analysis. The new IBGT model is used to describe measurements for extracting the essential physical device parameters of the model. With these extracted parameters, the new IGBT model consistently describes the measured electrical characteristics of IGBTs with different base lifetimes. The important electrical characteristics of the IGBT are the on-state I-V characteristics, the steady-state saturation current, and the switching transient current and voltage waveforms. The transient waveforms are examined in detail for constant anode voltage switching, clamped inductive load switching, and series resistor, inductor load switching.

  9. Carrier tunneling in models of irradiated heterojunction bipolar transistors

    SciTech Connect

    Wampler, William R.; Myers, Samuel Maxwell

    2014-08-01

    As part of Sandia's program to simulate the effect of displacement damage on operation of heterojunction bipolar transistors (HBTs), we are examining the formulation in 1-D of band-to-band (bb) and band-to-trap (b-t) carrier tunneling.

  10. Experiments with Charge Indicator Based on Bipolar Transistors

    ERIC Educational Resources Information Center

    Dvorak, Leos; Planinsic, Gorazd

    2012-01-01

    A simple charge indicator with bipolar transistors described recently enables us to perform a number of experiments suitable for high-school physics. Several such experiments are presented and discussed in this paper as well as some features of the indicator important for its use in schools, namely its sensitivity and robustness, i.e. the…

  11. Computer simulation of the scaled power bipolar SHF transistor structures

    NASA Astrophysics Data System (ADS)

    Nelayev, V. V.; Efremov, V. A.; Snitovsky, Yu. P.

    2007-04-01

    New advanced technology for creation of the npn power silicon bipolar SHF transistor structure is proposed. Preferences of the advanced technology in comparison with standard technology are demonstrated. Simulation of both technology flows was performed with emphasis on scaling of the discussed device structure.

  12. Total dose and dose rate models for bipolar transistors in circuit simulation.

    SciTech Connect

    Campbell, Phillip Montgomery; Wix, Steven D.

    2013-05-01

    The objective of this work is to develop a model for total dose effects in bipolar junction transistors for use in circuit simulation. The components of the model are an electrical model of device performance that includes the effects of trapped charge on device behavior, and a model that calculates the trapped charge densities in a specific device structure as a function of radiation dose and dose rate. Simulations based on this model are found to agree well with measurements on a number of devices for which data are available.

  13. Terahertz emission from collapsing field domains during switching of a gallium arsenide bipolar transistor.

    PubMed

    Vainshtein, Sergey; Kostamovaara, Juha; Yuferev, Valentin; Knap, Wojciech; Fatimy, Abdel; Diakonova, Nina

    2007-10-26

    Broadband pulsed THz emission with peak power in the sub-mW range has been observed experimentally during avalanche switching in a gallium arsenide bipolar junction transistor at room temperature, while significantly higher total generated power is predicted in simulations. The emission is attributed to very fast oscillations in the conductivity current across the switching channels, which appear as a result of temporal evolution of the field domains generated in highly dense electron-hole plasma. This plasma is formed in turn by powerful impact ionization in multiple field domains of ultrahigh amplitude.

  14. Vertical Bipolar Charge Plasma Transistor with Buried Metal Layer

    PubMed Central

    Nadda, Kanika; Kumar, M. Jagadesh

    2015-01-01

    A self-aligned vertical Bipolar Charge Plasma Transistor (V-BCPT) with a buried metal layer between undoped silicon and buried oxide of the silicon-on-insulator substrate, is reported in this paper. Using two-dimensional device simulation, the electrical performance of the proposed device is evaluated in detail. Our simulation results demonstrate that the V-BCPT not only has very high current gain but also exhibits high BVCEO · fT product making it highly suitable for mixed signal high speed circuits. The proposed device structure is also suitable for realizing doping-less bipolar charge plasma transistor using compound semiconductors such as GaAs, SiC with low thermal budgets. The device is also immune to non-ideal current crowding effects cropping up at high current densities. PMID:25597295

  15. Vertical bipolar charge plasma transistor with buried metal layer.

    PubMed

    Nadda, Kanika; Kumar, M Jagadesh

    2015-01-19

    A self-aligned vertical Bipolar Charge Plasma Transistor (V-BCPT) with a buried metal layer between undoped silicon and buried oxide of the silicon-on-insulator substrate, is reported in this paper. Using two-dimensional device simulation, the electrical performance of the proposed device is evaluated in detail. Our simulation results demonstrate that the V-BCPT not only has very high current gain but also exhibits high BVCEO · f(T) product making it highly suitable for mixed signal high speed circuits. The proposed device structure is also suitable for realizing doping-less bipolar charge plasma transistor using compound semiconductors such as GaAs, SiC with low thermal budgets. The device is also immune to non-ideal current crowding effects cropping up at high current densities.

  16. InP Heterojunction Bipolar Transistor Amplifiers to 255 GHz

    NASA Technical Reports Server (NTRS)

    Radisic, Vesna; Sawdai, Donald; Scott, Dennis; Deal, William; Dang, Linh; Li, Danny; Cavus, Abdullah; To, Richard; Lai, Richard

    2009-01-01

    Two single-stage InP heterojunction bipolar transistor (HBT) amplifiers operate at 184 and 255 GHz, using Northrop Grumman Corporation s InP HBT MMIC (monolithic microwave integrated circuit) technology. At the time of this reporting, these are reported to be the highest HBT amplifiers ever created. The purpose of the amplifier design is to evaluate the technology capability for high-frequency designs and verify the model for future development work.

  17. ST Rad-Hard Power Bipolar Transistors Product Portfolio

    NASA Astrophysics Data System (ADS)

    Camonita, Giuseppe; Pintacuda, Francesco

    2011-10-01

    This article describes the STMicroelectronics Rad-Hard Bipolar Transistors product range addressed specifically for space applications. Available up to 100krad Total Ionized Dose radiation level at LDRS (Low Dose Rate Sensitivity) conditions, they are qualified according to the ESCC specifications. Here follows the main features, the characterization curves including static and dynamic behaviours, and the radiation performances for some products. Also some application examples are given.

  18. Doping To Reduce Base Resistances Of Bipolar Transistors

    NASA Technical Reports Server (NTRS)

    Lin, True-Lon

    1991-01-01

    Modified doping profile proposed to reduce base resistance of bipolar transistors. A p/p+ base-doping profile reduces base resistance without reducing current gain. Proposed low/high base-doping profile realized by such low-temperature deposition techniques as molecular-beam epitaxy, ultra-high-vacuum chemical-vapor deposition, and limited-reaction epitaxy. Produces desired doping profiles without excessive diffusion of dopant.

  19. Use of MOS structures for the investigation of low-dose-rate effects in bipolar transistors

    SciTech Connect

    Belyakov, V.V.; Pershenkov, V.S.; Shalnov, A.V.; Shvetzov-Shilovsky, I.N.

    1995-12-01

    A possible physical mechanism for bipolar transistor low-dose-rate irradiation response is discussed. This mechanism is described in terms of shallow electron traps in oxide. The experimental results on positive charge build-up at low dose-rates and small electric field in oxide are presented. The use of MOS transistor in bipolar mode for investigation of surface peripheral recombination current in bipolar transistor and extraction of MOS structure physical parameters is described.

  20. Thermal management to avoid the collapse of current gain in power heterojunction bipolar transistors

    SciTech Connect

    Liu, W.

    1995-12-31

    One undesirable thermal phenomenon occurring in power heterojunction bipolar transistor is the collapse of current gain. This paper presents the electrical, electrical-thermal, thermal, and material approaches to avoid the collapse, and thus to improve the transistor output power.

  1. Characterization of leakage current related to a selectively grown collector in SiGeC heterojunction bipolar transistor structure

    NASA Astrophysics Data System (ADS)

    Suvar, E.; Haralson, E.; Radamson, H. H.; Wang, Y.-B.; Grahn, J. V.; Malm, B. G.; Östling, M.

    2004-03-01

    Sources of base-collector and base-emitter leakage current in a SiGeC-based heterojunction bipolar transistor (HBT) with a selectively grown and chemical-mechanical polished (CMP) collector are discussed. Transmission electron microscopy and electrical measurement have been applied to investigate the leakage current. It has been demonstrated that the edge-located defects generated by selective epitaxy process are the origin of the junction leakage.

  2. 1/f noise in positive-negative-positive (PNP) polycrystalline silicon-emitter bipolar transistors

    NASA Astrophysics Data System (ADS)

    Hoque, Md Mazhar Ul; Celik-Butler, Zeynep; Trogolo, Joe; Weiser, Douglas; Green, Keith

    2005-04-01

    The origin of 1/f fluctuations in positive-negative-positive (PNP) polycrystalline silicon-emitter bipolar-junction transistors is described. The interfacial oxide (IFO) at the monosilicon-polycrystalline silicon interface is found to significantly affect the noise behavior. The low-frequency noise originates from two independent fluctuation mechanisms: in the diffusion and tunneling components of the base current noise power spectral density (SI_B) and from the diffusion current and carrier number fluctuations in the collector current noise power spectral density (SI_C). The Hooge noise parameters for electrons and holes are calculated from the diffusion fluctuation models for SI_B and SI_C, respectively. Noise measurements on devices with different sizes and different IFO thicknesses indicate that the fluctuations occur in the minority-carrier (electron) tunneling current component of SI_B through the IFO. The thickness of the IFO is estimated using this noise model. The tunneling fluctuations dominate over the diffusion fluctuations for the smaller (0.7×0.7μm2) transistors, while the opposite is the case for the larger (0.7×100μm2) ones. The scaling effect on the noise performance of these transistors is discussed. The effect of the IFO on the dc characteristics and the noise behavior of the PNP transistors is compared to that of the negative-positive-negative (NPN) counterparts on the same wafer.

  3. The effects of gamma irradiation on neutron displacement sensitivity of lateral PNP bipolar transistors

    NASA Astrophysics Data System (ADS)

    Wang, Chenhui; Chen, Wei; Liu, Yan; Jin, Xiaoming; Yang, Shanchao; Qi, Chao

    2016-09-01

    The effects of gamma irradiation on neutron displacement sensitivity of four types of lateral PNP bipolar transistors (LPNPs) with different neutral base widths, emitter widths and the doping concentrations of the epitaxial base region are studied. The physical mechanisms of the effects are explored by defect analysis using deep level transient spectroscopy (DLTS) techniques and numerical simulations of recombination process in the base region of the lateral PNP bipolar transistors, and are verified by the experiments on gate-controlled lateral PNP bipolar transistors (GCLPNPs) manufactured in the identical commercial bipolar process with different gate bias voltage. The results indicate that gamma irradiation increases neutron displacement damage sensitivity of lateral PNP bipolar transistors and the mechanism of this phenomenon is that positive charge induced by gamma irradiation enhances the recombination process in the defects induced by neutrons in the base region, leading to larger recombination component of base current and greater gain degradation.

  4. GaAs vapor-grown bipolar transistors.

    NASA Technical Reports Server (NTRS)

    Nuese, C. J.; Gannon, J. J.; Dean, R. H.; Gossenberger, H. F.; Enstrom, R. E.

    1972-01-01

    Discussion of an approach for the fabrication of high-temperature GaAs transistors which is centered on the preparation of n-p-n three-layered structures entirely by a vapor-phase growth technique, as described by Tietjen and Amick (1966). The low growth temperature of approximately 750 C is thought to reduce contamination during crystal growth and to contribute to the reasonably high minority-carrier lifetimes obtained for the vapor-grown p-n junctions. The fact that impurity concentrations and layer thicknesses can be precisely controlled for epitaxial layers as thin as 1 micrometer is an important feature of this growth technique.

  5. High-performance InGaP/GaAs pnp {delta}-doped heterojunction bipolar transistor

    SciTech Connect

    Tsai, J.-H. Chiu, S.-Y.; Lour, W.-S.; Guo, D.-F.

    2009-07-15

    In this article, a novel InGaP/GaAs pnp {delta}-doped heterojunction bipolar transistor is first demonstrated. Though the valence band discontinuity at InGaP/GaAs heterojunction is relatively large, the addition of a {delta}-doped sheet between two spacer layers at the emitter-base (E-B) junction effectively eliminates the potential spike and increases the confined barrier for electrons, simultaneously. Experimentally, a high current gain of 25 and a relatively low E-B offset voltage of 60 mV are achieved. The offset voltage is much smaller than the conventional InGaP/GaAs pnp HBT. The proposed device could be used for linear amplifiers and low-power complementary integrated circuit applications.

  6. Electrical properties of the InP/InGaAs pnp heterostructure-emitter bipolar transistor

    SciTech Connect

    Tsai, J. H. Liu, W. Ch.; Guo, D. F.; Kang, Y. Ch.; Chiu, Sh. Y.; Lour, W. Sh.

    2008-03-15

    The dc performances of an InP/InGaAs pnp heterostructure-emitter bipolar transistor are investigated by theoretical analysis and experimental results. Though the valence band discontinuity at the InP/InGaAs heterojunction is relatively large, the addition of a heavily-doped as well as thin p{sup +}-InGaAs emitter layer between p-InP confinement and n{sup +}-InGaAs base layers effectively eliminates the potential spike at emitter-base junction and simultaneously lowers the emitter-collector offset voltage and increases the potential barrier for electrons. Experimentally, a high current gain of 88 and a low offset voltage of 54 mV have been achieved.

  7. Microwave damage susceptibility trend of a bipolar transistor as a function of frequency

    NASA Astrophysics Data System (ADS)

    Ma, Zhen-Yang; Chai, Chang-Chun; Ren, Xing-Rong; Yang, Yin-Tang; Chen, Bin; Song, Kun; Zhao, Ying-Bo

    2012-09-01

    We conduct a theoretical study of the damage susceptibility trend of a typical bipolar transistor induced by a high-power microwave (HPM) as a function of frequency. The dependences of the burnout time and the damage power on the signal frequency are obtained. Studies of the internal damage process and the mechanism of the device are carried out from the variation analysis of the distribution of the electric field, current density, and temperature. The investigation shows that the burnout time linearly depends on the signal frequency. The current density and the electric field at the damage position decrease with increasing frequency. Meanwhile, the temperature elevation occurs in the area between the p-n junction and the n-n+ interface due to the increase of the electric field. Adopting the data analysis software, the relationship between the damage power and frequency is obtained. Moreover, the thickness of the substrate has a significant effect on the burnout time.

  8. InAlAsSb/InGaSb Double Heterojunction Bipolar Transistor

    DTIC Science & Technology

    2005-03-01

    Papanicolaou An npn double heterojunction bipolar transistor has been made using In0.27Ga0.73Sb for the base and two different InxAl1-xAsySb1-y alloys...zSb base constitute a new group of semiconductors for making an npn double heterojunction bipolar transistor (DHBT). The group of alloys reported here...MAR 2005 2. REPORT TYPE 3. DATES COVERED 00-00-2005 to 00-00-2005 4. TITLE AND SUBTITLE InAlAsSb/InGaSb double heterojunction bipolar transistor

  9. Comprehensive failure analysis of leakage faults in bipolar transistors

    NASA Astrophysics Data System (ADS)

    Domengès, B.; Murray, H.; Schwindenhammer, P.; Imbert, G.

    2004-02-01

    The origin of a leakage current in several failed NPN bipolar transistors has been identified by complementary advanced failure analysis techniques. After precise localization of the failing area by photon emission microscopy and optical beam induced resistance change investigations, a focus ion beam technique was used to prepare thin lamellae adequate for transmission electron microscopy (TEM) study. Characterization of the related microstructure was performed by TEM and energy-dispersive spectrometry nanobeam analyses. It was identified as Ti-W containing trickle-like residue located at the surface of the spacers. Current-voltage measurements could be related to such structure defects and the involved conduction mechanism was identified as the Poole-Frenkel effect.

  10. Simulations of InGaN-base heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Lee, K. P.; Ren, F.; Pearton, S. J.; Dabiran, A. M.; Chow, P. P.

    2003-06-01

    GaN/InGaN heterojunction bipolar transistors (HBTs) are very promising for high speed, high power density applications at elevated temperatures. In this paper we report on simulations of the dc performance of GaN/In 0.2Ga 0.8N HBTs as a function of the layer design and doping levels. The conductivity of p-InGaN is significantly lower than p-GaN, reducing the deleterious effects of high ohmic contact resistance. Predicted dc current gains are given as a function of base doping and thickness and are in excess of several hundred even for aggressive layer designs. Advantages with respect to GaN base HBTs are also discussed.

  11. Development of gallium nitride-based PNP heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Green, Daniel S.

    GaN-based electronics have progressed mightily in the last 15 years. The primary focus of this development has been the AlGaN/GaN heterostructure FET, with the commercialization of this device in progress. Bipolar transistors however offer a few key potential advantages over the FET device, including the primary advantage of normally off operation. Additionally, the pnp heterostructure bipolar transistor (HBT) in particular offers more attractive base performance relative to the npn HBT. The pnp HBT also serves as an excellent test vehicle for the several material parameters of p-Gan that remain poor defined. However, implementation of the pnp HBT has been limited by the difficulty contacting p-GaN collector material. This work was designed to demonstrate and understand the pnp HBT. The research served as both an engineering challenge as well as an investigation of physical parameters governing the transport in the device. In order to remedy the poor collector contact available with buried p-GaN, a transformation diode HBT structure was introduced that added an n-type subcollector the HBT structure. This allowed for good collector contact at the cost of introducing an offset voltage to the HBT performance due to the turn-on voltage of the transformation diode under normal operation. The first transformation diode HBT in GaN was successful demonstrated. In order to improve the transformation diode performance, successive design iterations were performed to isolate the performance limiting elements. Device designs were implemented to mitigate saturated hole velocity, as well as to decrease base transit time through aggressive base scaling and compositional grading. Physical simulations and modelling of device non-idealities were used to understand actual device performance. Hole lifetime and saturated hole velocity were identified as primary contributors to lower than expected performance device performance. Successive device iterations yielded HBT performance of

  12. Understanding the failure mechanisms of microwave bipolar transistors caused by electrostatic discharge

    NASA Astrophysics Data System (ADS)

    Jin, Liu; Yongguang, Chen; Zhiliang, Tan; Jie, Yang; Xijun, Zhang; Zhenxing, Wang

    2011-10-01

    Electrostatic discharge (ESD) phenomena involve both electrical and thermal effects, and a direct electrostatic discharge to an electronic device is one of the most severe threats to component reliability. Therefore, the electrical and thermal stability of multifinger microwave bipolar transistors (BJTs) under ESD conditions has been investigated theoretically and experimentally. 100 samples have been tested for multiple pulses until a failure occurred. Meanwhile, the distributions of electric field, current density and lattice temperature have also been analyzed by use of the two-dimensional device simulation tool Medici. There is a good agreement between the simulated results and failure analysis. In the case of a thermal couple, the avalanche current distribution in the fingers is in general spatially unstable and results in the formation of current crowding effects and crystal defects. The experimental results indicate that a collector-base junction is more sensitive to ESD than an emitter-base junction based on the special device structure. When the ESD level increased to 1.3 kV, the collector-base junction has been burnt out first. The analysis has also demonstrated that ESD failures occur generally by upsetting the breakdown voltage of the dielectric or overheating of the aluminum-silicon eutectic. In addition, fatigue phenomena are observed during ESD testing, with devices that still function after repeated low-intensity ESDs but whose performances have been severely degraded.

  13. A device model for thin silicon-on-insulator SiGe heterojunction bipolar transistors with saturation effects

    NASA Astrophysics Data System (ADS)

    Xu, Xiao-Bo; Xu, Kai-Xuan; Zhang, He-Ming; Qin, Shan-Shan

    2011-09-01

    In this paper, we describe the saturation effect of a silicon germanium (SiGe) heterojunction bipolar transistor (HBT) fabricated on a thin silicon-on-insulator (SOI) with a step-by-step derivation of the model formulation. The collector injection width, the internal base—collector bias, and the hole density at the base—collector junction interface are analysed by considering the unique features of the internal and the external parts of the collector, as they are different from those of a bulk counterpart.

  14. Neutron effects on the electrical and switching characteristics of NPN bipolar power transistors

    NASA Technical Reports Server (NTRS)

    Frasca, Albert J.; Schwarze, Gene E.

    1988-01-01

    The use of nuclear reactors to generate electrical power for future space missions will require the electrical components used in the power conditioning, control, and transmission subsystem to operate in the associated radiation environments. An initial assessment of neutron irradiation on the electrical and switching characteristics of commercial high power NPN bipolar transistors was investigated. The results clearly show the detrimental effects caused by neutron irradiation on the electrical and switching characteristics of the NPN bipolar power transistor.

  15. Long-Term Reliability of High Speed SiGe/Si Heterojunction Bipolar Transistors

    NASA Technical Reports Server (NTRS)

    Ponchak, George E. (Technical Monitor); Bhattacharya, Pallab

    2003-01-01

    Accelerated lifetime tests were performed on double-mesa structure Si/Si0.7Ge0.3/Si npn heterojunction bipolar transistors, grown by molecular beam epitaxy, in the temperature range of 175C-275C. Both single- and multiple finger transistors were tested. The single-finger transistors (with 5x20 micron sq m emitter area) have DC current gains approximately 40-50 and f(sub T) and f(sub MAX) of up to 22 GHz and 25 GHz, respectively. The multiple finger transistors (1.4 micron finger width, 9 emitter fingers with total emitter area of 403 micron sq m) have similar DC current gain but f(sub T) of 50 GHz. It is found that a gradual degradation in these devices is caused by the recombination enhanced impurity diffusion (REID) of boron atoms from the p-type base region and the associated formation of parasitic energy barriers to electron transport from the emitter to collector layers. This REID has been quantitatively modeled and explained, to the first order of approximation, and the agreement with the measured data is good. The mean time to failure (MTTF) of the devices at room temperature is estimated from the extrapolation of the Arrhenius plots of device lifetime versus reciprocal temperature. The results of the reliability tests offer valuable feedback for SiGe heterostructure design in order to improve the long-term reliability of the devices and circuits made with them. Hot electron induced degradation of the base-emitter junction was also observed during the accelerated lifetime testing. In order to improve the HBT reliability endangered by the hot electrons, deuterium sintered techniques have been proposed. The preliminary results from this study show that a deuterium-sintered HBT is, indeed, more resistant to hot-electron induced base-emitter junction degradation. SiGe/Si based amplifier circuits were also subjected to lifetime testing and we extrapolate MTTF is approximately 1.1_10(exp 6) hours at 125iC junction temperature from the circuit lifetime data.

  16. Electrical coupling of single cardiac rat myocytes to field-effect and bipolar transistors.

    PubMed

    Kind, Thomas; Issing, Matthias; Arnold, Rüdiger; Müller, Bernt

    2002-12-01

    A novel bipolar transistor for extracellular recording the electrical activity of biological cells is presented, and the electrical behavior compared with the field-effect transistor (FET). Electrical coupling is examined between single cells separated from the heart of adults rats (cardiac myocytes) and both types of transistors. To initiate a local extracellular voltage, the cells are periodically stimulated by a patch pipette in voltage clamp and current clamp mode. The local extracellular voltage is measured by the planar integrated electronic sensors: the bipolar and the FET. The small signal transistor currents correspond to the local extracellular voltage. The two types of sensor transistors used here were developed and manufactured in the laboratory of our institute. The manufacturing process and the interfaces between myocytes and transistors are described. The recordings are interpreted by way of simulation based on the point-contact model and the single cardiac myocyte model.

  17. The Role of the Silicon Germanium (SiGe) Heterojunction Bipolar Transistor (HBT) in Mobile Technology Platforms

    DTIC Science & Technology

    2011-09-01

    The Role of the Silicon Germanium (SiGe) Heterojunction Bipolar Transistor (HBT) in Mobile Technology Platforms by Gregory A. Mitchell...Germanium (SiGe) Heterojunction Bipolar Transistor (HBT) in Mobile Technology Platforms 5a. CONTRACT NUMBER 5b. GRANT NUMBER 5c. PROGRAM ELEMENT...MD 20783-1197 ARL-TN-0459 September 2011 The Role of the Silicon Germanium (SiGe) Heterojunction Bipolar Transistor (HBT) in Mobile

  18. Hot-carrier induced degradation and recovery in polysilicon-emitter bipolar transistors

    NASA Astrophysics Data System (ADS)

    Sheng, S. R.; McAlister, S. P.; Storey, C.; Lee, L.-S.; Hwang, H. P.

    2002-10-01

    The hot-carrier induced degradation in submicron polysilicon-emitter NPN bipolar transistors with different emitter geometries and its post-stress reversibility have been investigated in detail. We show that the hot-carrier induced degradation during reverse emitter-base (EB) bias stressing can alter the EB junction, as well as the collector-base junction region. Oxide/silicon interface traps and positive charged defects are generated by the hot-carrier injection, both of which cause an increase in the low bias base current, and consequently degradation in the current gain. Our results confirm that the oxide/silicon interface traps generated by electrical stressing are located in the same region as those present in unstressed devices--around the emitter perimeter. The hot-carrier induced changes are not stable even at room temperature, and are partially reversed by annealing at 300 °C, indicating the existence of both a reversible component, with a broad distribution of annealing activation energies, and an irreversible component. We suggest that more than one microscopic process determines the hot-carrier induced degradation in devices. Which process plays a dominant role in a given device may be dependent on device technologies employed and stressing conditions.

  19. Development of Gate and Base Drive Using SiC Junction Field Effect Transistors

    DTIC Science & Technology

    2008-05-01

    Development of Gate and Base Drive Using SiC Junction Field Effect Transistors by Timothy E. Griffin ARL-TR-4475 May 2008...Development of Gate and Base Drive Using SiC Junction Field Effect Transistors Timothy E. Griffin Sensors and Electron Devices...Effect Transistors 5c. PROGRAM ELEMENT NUMBER 5d. PROJECT NUMBER 5e. TASK NUMBER 6. AUTHOR(S) Timothy E. Griffin 5f. WORK UNIT NUMBER

  20. Current gain rolloff in graded-base SiGe heterojunction bipolar transistors

    SciTech Connect

    Crabbe, E.F.; Cressler, J.D.; Patton, G.L.; Stork, J.M.C.; Comfort, J.H.; Sun, J.Y.C. )

    1993-04-01

    The authors report the experimental observation of a novel effect in SiGe heterojunction bipolar transistors (HBT's) with graded bases which results in a significant emitter-base bias dependence of the current gain. The nonideal collector current is caused by the interaction of the bias dependence of the emitter-base space-charge region width and the exponential dependence of the collector current on the germanium concentration at the edge of the space-charge region. The resulting current gain rolloff must be taken into account for accurate modeling of bipolar transistors with bandgap grading in the base.

  1. Improved performance of bipolar charge plasma transistor by reducing the horizontal electric field

    NASA Astrophysics Data System (ADS)

    Bramhane, Lokesh Kumar; Singh, Jawar

    2017-04-01

    In this paper, we have proposed a modified lateral bipolar charge plasma transistor (BCPT). The appropriate work function engineering is used to induce the electron-hole concentrations under different regions. The reduced work function difference and absence of oxide layer (tox) in the proposed lateral BCPT reduce the horizontal electric field (EX) at the emitter. Also, reduced work function difference at base metal contact decreases the electric field at base-emitter and base-collector junctions. 2-D TCAD simulations of the proposed device reveal that there are evenly spaced output characteristic curves, improved cut-off frequency and breakdown voltage. The reduction in horizontal electric field about one-fourth compared to the conventional lateral BCPT results in realistic current gain (β) and reduced on-set voltage makes proposed device suitable for low power applications. The proposed device exhibits improved cut-off frequency (fT = 7.5 GHz) compared to the lateral BCPT (3.7 GHz) and improved current gain (37.67) and same cut-off frequency (= 7.5 GHz) compared to the conventional BJT (β = 26.5 &fT = 7.5 GHz).

  2. Tunneling Current of Electron in Armchair Graphene Nanoribbon Bipolar Transistor Model Using Transfer Matrix Method

    NASA Astrophysics Data System (ADS)

    Fahmi, A. K.; Hasanah, L.; Rusdiana, D.; Aminudin, A.; Suhendi, E.

    2017-03-01

    The tunneling current of n-p-n bipolar junction transistor AGNR-based is modeled with semi-numerical method. The exponential solution from Schrödinger equation is used and solved analytically. The potential profile of n-p-n BJT divided into several segments in the numerical method. Then, the solved analytical result is used in the numerical method to compute the electron transmittance. Transfer Matrix Method (TMM) is the numerical method used to compute the electron transmittance. From the calculated transmittance the tunneling current can be computed by using Landauer formula with aid of Gauss-Legendre Quadrature (GLQ). Next, the tunneling current is computed with several change of variables which are base-emitter voltage (VBE), base-collector voltage (VBC), temperature and the AGNR’s width. The computed tunneling current shows that the larger value of applied voltage for both VBE and VBC results in larger value of tunneling current. At the lower temperature, the current is larger. The computed tunneling current shows that at wider width of AGNR, the current is also larger. This is due to the decreased band-gap energy (Eg) because of the wider width of AGNR.

  3. A Physics-Based Heterojunction Bipolar Transistor Model for Integrated Circuit Simulation

    DTIC Science & Technology

    1993-12-01

    base-emitter capacitance; C, is the total base-collector capacitance; g, is the dynamic base-emitter junction conductance; go is the dynamic base...Large-signal junction transistor equivalent circuit (21:61]. gp (’ ’ gE -w CU gm’’ go RE Figure 1.8 Hybrid-if small-signal junction transistor...Forward Base Conductance: ( 3.28 8Ig (3.29) Output (Collector) Conductance: go I V W cow .. S.ax, J(3.30) Transconductance: ga- I V-y• ca- . Both

  4. InGaP/InGaAsN/GaAs NpN double-heterojunction bipolar transistor

    NASA Astrophysics Data System (ADS)

    Chang, P. C.; Baca, A. G.; Li, N. Y.; Xie, X. M.; Hou, H. Q.; Armour, E.

    2000-04-01

    We have demonstrated a functional NpN double-heterojunction bipolar transistor (DHBT) using InGaAsN for the base layer. The InGaP/In0.03Ga0.97As0.99N0.01/GaAs DHBT has a low VON of 0.81 V, which is 0.13 V lower than in a InGaP/GaAs heterojunction bipolar transistor (HBT). The lower turn-on voltage is attributed to the smaller band gap (1.20 eV) of metalorganic chemical vapor deposition-grown In0.03Ga0.97As0.99N0.01 base layer. GaAs is used for the collector; thus the breakdown voltage (BVCEO) is 10 V, consistent with the BVCEO of InGaP/GaAs HBTs of comparable collector thickness and doping level. To alleviate the current blocking phenomenon caused by the larger conduction band discontinuity between InGaAsN and GaAs, a graded InGaAs layer with δ doping is inserted at the base-collector junction. The improved device has a peak current gain of seven with ideal current-voltage characteristics.

  5. InGaP/InGaAsN/GaAs NpN double-heterojunction bipolar transistor

    SciTech Connect

    Chang, P. C.; Baca, A. G.; Li, N. Y.; Xie, X. M.; Hou, H. Q.; Armour, E.

    2000-04-17

    We have demonstrated a functional NpN double-heterojunction bipolar transistor (DHBT) using InGaAsN for the base layer. The InGaP/In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01}/GaAs DHBT has a low V{sub ON} of 0.81 V, which is 0.13 V lower than in a InGaP/GaAs heterojunction bipolar transistor (HBT). The lower turn-on voltage is attributed to the smaller band gap (1.20 eV) of metalorganic chemical vapor deposition-grown In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01} base layer. GaAs is used for the collector; thus the breakdown voltage (BV{sub CEO}) is 10 V, consistent with the BV{sub CEO} of InGaP/GaAs HBTs of comparable collector thickness and doping level. To alleviate the current blocking phenomenon caused by the larger conduction band discontinuity between InGaAsN and GaAs, a graded InGaAs layer with {delta} doping is inserted at the base-collector junction. The improved device has a peak current gain of seven with ideal current-voltage characteristics. (c) 2000 American Institute of Physics.

  6. Defect-driven gain bistability in neutron damaged, silicon bipolar transistors

    SciTech Connect

    Fleming, R. M.; Seager, C. H.; Lang, D. V.; Bielejec, E.; Campbell, J. M.

    2007-04-23

    Using deep level transient spectroscopy, the authors have measured the defect spectrum in the collector of a n-p-n bipolar transistor following fast neutron irradiation as well as the gain on the same device. They show that a slow change observed in both the gain and deep level traps in the n-type collector at 300 K are bistable. The transistor gain and the defects can be returned to the postirradiation condition by forward bias at room temperature, i.e., by operating the transistor (gain) or injection through the base-collector diode (defect spectrum)

  7. Total dose radiation effects on hardened SOI bipolar transistors using the NPS LINAC

    NASA Astrophysics Data System (ADS)

    Brittain, Donald R., Jr.

    1995-03-01

    Silicon-on-insulator bipolar transistors fabricated using the Harris UHF-1 process, were irradiated at room temperature with 30 and 60 MeV electron beams. Some of the transistors on each die were configured and biased as a simple operational amplifier (opamp), one was placed in a common emitter type circuit and the remaining were biased to measure transistor parameter degradation. The purpose of this setup was to observe the total dose effects of the transistor and of an opamp on the same die in order to derive a more accurate model of an opamp under total dose conditions. This investigation was successful in conducting in-situ measurements of opamp gain and 3dB frequency while also measuring the current gain of similar transistors on the same die.

  8. A breakdown model for the bipolar transistor to be used with circuit simulators

    SciTech Connect

    Keshavarz, A.A.; Raney, C.W.; Campbell, D.C.

    1993-08-01

    A breakdown model for the output characteristics of the bipolar transistor (bjt) has been developed. The behavioral modeling capability of PSPICE, a popular SPICE program (with Emphasis on Integrated circuits) was used to implement the macromodel. The model predicts bjt output characteristics under breakdown conditions. Experimental data was obtained to verify the macromodel. Good agreement exits between the measured and the simulated results.

  9. 300 Degree C GaN/AlGaN Heterojunction Bipolar Transistor

    SciTech Connect

    Abernathy, C.R.; Baca, A.G.; Cho, H.; Chow, P.P.; Han, J.; Hichman, R.A.; Jung, K.B.; Kopf, R.F.; La Roche, J.R.; Pearton, S.J.; Ren, F.; Shul, R.J.; Van Hove, J.M.; Wilson, R.G.

    1998-10-14

    A GaN/AIGaN heterojunction bipolar transistor has been fabricated using C12/Ar dry etching for mesa formation. As the hole concentration increases due to more efficient ionization of the Mg acceptors at elevated temperatures (> 250oC), the device shows improved gain. Future efforts which are briefly summarized. should focus on methods for reducing base resistance.

  10. Epitaxially-Grown GaN Junction Field Effect Transistors

    SciTech Connect

    Baca, A.G.; Chang, P.C.; Denbaars, S.P.; Lester, L.F.; Mishra, U.K.; Shul, R.J.; Willison, C.G.; Zhang, L.; Zolper, J.C.

    1999-05-19

    Junction field effect transistors (JFET) are fabricated on a GaN epitaxial structure grown by metal organic chemical vapor deposition (MOCVD). The DC and microwave characteristics of the device are presented. A junction breakdown voltage of 56 V is obtained corresponding to the theoretical limit of the breakdown field in GaN for the doping levels used. A maximum extrinsic transconductance (gm) of 48 mS/mm and a maximum source-drain current of 270 mA/mm are achieved on a 0.8 µ m gate JFET device at VGS= 1 V and VDS=15 V. The intrinsic transconductance, calculated from the measured gm and the source series resistance, is 81 mS/mm. The fT and fmax for these devices are 6 GHz and 12 GHz, respectively. These JFETs exhibit a significant current reduction after a high drain bias is applied, which is attributed to a partially depleted channel caused by trapped hot-electrons in the semi-insulating GaN buffer layer. A theoretical model describing the current collapse is described, and an estimate for the length of the trapped electron region is given.

  11. Type-II InP/GaAsSb double-heterojunction bipolar transistors with fMAX > 700 GHz

    NASA Astrophysics Data System (ADS)

    Flückiger, Ralf; Lövblom, Rickard; Alexandrova, Maria; Ostinelli, Olivier; Bolognesi, Colombo R.

    2014-03-01

    The “type-II” staggered band lineup at the base-collector junction of InP/GaAsSb double-heterojunction bipolar transistors (DHBTs) eliminates the current blocking effect observed in InP/GaInAs DHBTs and allows the use of a pure binary InP collector that provides a high breakdown voltage and good thermal conductivity. Improvement of the power gain cutoff frequency fMAX requires a reduction in base resistance and/or base-collector capacitance. We have decreased the base contact resistivity by in situ Ar sputtering immediately prior to the base contact deposition. The resulting DHBTs simultaneously feature fT = 429 GHz and fMAX = 715 GHz. To the best of the authors’ knowledge, this is the highest reported fMAX for InP/GaAsSb-based DHBTs to date.

  12. A new InGaP/GaAs tunneling heterostructure-emitter bipolar transistor (T-HEBT)

    SciTech Connect

    Tsai, Jung-Hui; Lee, Ching-Sung; Lour, Wen-Shiung; Ma, Yung-Chun; Ye, Sheng-Shiun

    2011-05-15

    Excellent characteristics of an InGaP/GaAs tunneling heterostructure-emitter bipolar transistor (T-HEBT) are first demonstrated. The insertion of a thin n-GaAs emitter layer between tynneling confinement and base layers effectivelty eliminates the potential spike at base-emitter junction and reduces the collector-emitter offset voltage, while the thin InGaP tunneling confinement layer is employed to reduce the transporting time across emitter region for electrons and maintain the good confinement effect for holes. Experimentally, the studied T-HEBN exhibits a maximum current gain of 285, a relatively low offset voltage of 40 mW, and a current-gain cutoff frequency of 26.4 GHz.

  13. Lateral PNP bipolar transistor with aiding field diffusions

    NASA Technical Reports Server (NTRS)

    Gallagher, R. C.; Mc Cann, D. H.

    1969-01-01

    Fabrication technique produces field aided lateral PNP transistors compatible with micropower switching circuits. The sub-collector diffusion is performed with phosphorus as the dopant and the epitaxy is grown using the higher temperature silicon tetrachloride process.

  14. Transferred substrate heterojunction bipolar transistors for submillimeter wave applications

    NASA Technical Reports Server (NTRS)

    Fung, A.; Samoska, L.; Siegel, P.; Rodwell, M.; Urteaga, M.; Paidi, V.

    2003-01-01

    We present ongoing work towards the development of submillimeter wave transistors with goals of realizing advanced high frequency amplifiers, voltage controlled oscillators, active multipliers, and traditional high-speed digital circuits.

  15. Reply to ``Comments on `Effects of using the more accurate intrinsic concentration on bipolar transistor modeling' '' [J. Appl. Phys. 68, 5911 (1990)

    NASA Astrophysics Data System (ADS)

    Liou, J. J.

    1991-10-01

    This reply addresses the issues raised by Rode and Rosenbaum regarding the bipolar junction transistor model developed in the subject paper [J. Appl. Phys. 68, 5911(1990)]. The error associated with Eq. (4) in the subject paper is discussed and corrected, the value of the space-charge-region recombination time used is specified, and the results are recalculated. It is shown that the error in Eq. (4) does not alter notably the trends of the current gain calculated using the two different intrinsic concentrations.

  16. Dependence of low frequency noise in SiGe heterojunction bipolar transistors on the dimensional and structural features of extrinsic regions

    NASA Astrophysics Data System (ADS)

    Ul Hoque, Md Mazhar; Çelik-Butler, Zeynep; Martin, Samuel; Knorr, Chris; Bulucea, Constantin

    2006-07-01

    In this paper, the effects of different transistor design aspects on the noise behavior of SiGe heterojunction bipolar transistors have been investigated. Selectively implanted collector, although retards the base push-out, does not deteriorate the noise characteristics. Moreover, a higher dopant implant in the extrinsic base region intended for a smaller base resistance does not deteriorate the noise characteristics. While the interface between the SiGe epitaxial and polycrystalline layers does not have any detrimental impact, the emitter-poly overlap significantly influences both the DC and the noise characteristics. Smaller emitter-poly overlap results in an increased non-ideal base current at lower bias voltages and produces appreciable generation-recombination noise. For all the transistors, except for the ones with smaller emitter-poly overlap, the base current noise power spectral density shows a near quadratic dependence on the base current, where the noise is believed to originate mostly from the superposition of the generation-recombination noise in the intrinsic emitter-base junction. The base current noise power spectral density for the transistors with a smaller emitter-poly overlap shows a near linear dependence on the base current, which results from an increased contribution from the trap-assisted tunneling fluctuations of the minority carriers at the surface of the emitter-base junction.

  17. Ballistic bipolar junctions in chemically gated graphene ribbons

    PubMed Central

    Baringhaus, Jens; Stöhr, Alexander; Forti, Stiven; Starke, Ulrich; Tegenkamp, Christoph

    2015-01-01

    The realization of ballistic graphene pn-junctions is an essential task in order to study Klein tunneling phenomena. Here we show that intercalation of Ge under the buffer layer of pre-structured SiC-samples succeeds to make truly nano-scaled pn-junctions. By means of local tunneling spectroscopy the junction width is found to be as narrow as 5 nm which is a hundred times smaller compared to electrically gated structures. The ballistic transmission across the junction is directly proven by systematic transport measurements with a 4-tip STM. Various npn- and pnp-junctions are studied with respect to the barrier length. The pn-junctions are shown to act as polarizer and analyzer with the second junction becoming transparent in case of a fully ballistic barrier. This can be attributed to the almost full suppression of electron transmission through the junction away from normal incidence. PMID:25898259

  18. Experimental DC extraction of the thermal resistance of bipolar transistors taking into account the Early effect

    NASA Astrophysics Data System (ADS)

    d'Alessandro, Vincenzo

    2017-01-01

    This paper presents three methods to experimentally extract the thermal resistance of bipolar transistors taking into account the Early effect. The approaches are improved variants of recently-proposed techniques relying on common-base DC measurements. The accuracy is numerically verified by making use of a compact model calibrated on I-V characteristics of state-of-the-art SOG BJTs and SiGe:C HBTs.

  19. Unified planar process for fabricating heterojunction bipolar transistors and buried-heterostructure lasers utilizing impurity-induced disordering

    NASA Astrophysics Data System (ADS)

    Thornton, R. L.; Mosby, W. J.; Chung, H. F.

    1988-12-01

    We describe results on a novel geometry of heterojunction bipolar transistor that has been realized by impurity-induced disordering. This structure is fabricated by a method that is compatible with techniques for the fabrication of low threshold current buried-heterostructure lasers. We have demonstrated this compatibility by fabricating a hybrid laser/transistor structure that operates as a laser with a threshold current of 6 mA at room temperature, and as a transistor with a current gain of 5.

  20. Three-terminal heterojunction bipolar transistor solar cell for high-efficiency photovoltaic conversion

    PubMed Central

    Martí, A.; Luque, A.

    2015-01-01

    Here we propose, for the first time, a solar cell characterized by a semiconductor transistor structure (n/p/n or p/n/p) where the base–emitter junction is made of a high-bandgap semiconductor and the collector is made of a low-bandgap semiconductor. We calculate its detailed-balance efficiency limit and prove that it is the same one than that of a double-junction solar cell. The practical importance of this result relies on the simplicity of the structure that reduces the number of layers that are required to match the limiting efficiency of dual-junction solar cells without using tunnel junctions. The device naturally emerges as a three-terminal solar cell and can also be used as building block of multijunction solar cells with an increased number of junctions. PMID:25902374

  1. Three-terminal heterojunction bipolar transistor solar cell for high-efficiency photovoltaic conversion.

    PubMed

    Martí, A; Luque, A

    2015-04-22

    Here we propose, for the first time, a solar cell characterized by a semiconductor transistor structure (n/p/n or p/n/p) where the base-emitter junction is made of a high-bandgap semiconductor and the collector is made of a low-bandgap semiconductor. We calculate its detailed-balance efficiency limit and prove that it is the same one than that of a double-junction solar cell. The practical importance of this result relies on the simplicity of the structure that reduces the number of layers that are required to match the limiting efficiency of dual-junction solar cells without using tunnel junctions. The device naturally emerges as a three-terminal solar cell and can also be used as building block of multijunction solar cells with an increased number of junctions.

  2. Characterization, simulation and optimization of type-II gallium arsenic antimonide-based double heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Tao, Nick Gengming

    In recent years, GaAsSb/InP double heterojunction bipolar transistors (DHBTs) have been demonstrated to be promising alternatives to InP/InGaAs HBTs, for next generation microwave/millimeter wave applications and optoelectronic integrated circuits (OEICs). However, GaAsSb-based DHBTs featuring the novel base material and type-II band alignment have not been well studied. This thesis investigated type-II GaAsSb DHBTs in the following aspects: periphery surface recombination current, Kirk effect, two dimensional (2D) simulation and device optimization. The present work provided insights into device operation, and guidances for further device development. A series of physical models and parameters was implemented in 2D device simulations using ISE TCAD. Band gap narrowing (BGN) in the bases was characterized by comparing experimental and simulated results. Excellent agreements between the measured and simulated DC and RF results were achieved. Emitter size effects associated with the surface recombination current were experimentally characterized for emitter sizes of 0.5 by 6 to 80 by 80 square micrometer. The 2D simulations by implementing surface state models revealed the mechanism for the surface recombination current. Two device structures were proposed to diminish surface recombination current. Numerical simulations for type-II GaAsSb-InP base-collector (BC) junctions showed that conventional base "push-out" does not occur at high injection levels, and instead the electric field at the BC junction is reversed and an electron barrier at the base side evolves. The electron barrier was found to play an important role in the Kirk effect, and the electron tunnelling through the barrier delays the onset of the Kirk effect. This novel mechanism was supported by the measurement for GaAsSb/InP DHBTs with two base doping levels. The study also showed that the magnitude of the electric field at the BC junction at zero collector current directly affects onset of the Kirk

  3. Bipolar transport in organic field-effect transistors: organic semiconductor blends versus contact modification

    NASA Astrophysics Data System (ADS)

    Opitz, Andreas; Kraus, Michael; Bronner, Markus; Wagner, Julia; Brütting, Wolfgang

    2008-07-01

    The achievement of bipolar transport is an important feature of organic semiconductors, both for a fundamental understanding of transport properties and for applications such as complementary electronic devices. We have investigated two routes towards organic field-effect transistors exhibiting bipolar transport characteristics. As a first step, ambipolar field-effect transistors are realized by mixtures of p-conducting copper-phthalocyanine (CuPc) and n-conducting buckminsterfullerene (C60). As a second step, bipolar transport in copper-phthalocyanine is achieved by a modification of the gate dielectric in combination with a controlled variation of the electrode materials used for carrier injection. The analysis involves the determination of charge-carrier mobilities and contact resistances by a single curve analysis and by the transfer length method. Comparison of both types of samples indicates that percolation is a crucial feature in mixtures of both materials to achieve ambipolar carrier flow, whereas in neat films of one single material suitable contact modification allows for bipolar charge-carrier transport. In the latter case, the obtained electron and hole mobilities differ by less than one order of magnitude.

  4. Ionizing/displacement synergistic effects induced by gamma and neutron irradiation in gate-controlled lateral PNP bipolar transistors

    NASA Astrophysics Data System (ADS)

    Wang, Chenhui; Chen, Wei; Yao, Zhibin; Jin, Xiaoming; Liu, Yan; Yang, Shanchao; Wang, Zhikuan

    2016-09-01

    A kind of gate-controlled lateral PNP bipolar transistor has been specially designed to do experimental validations and studies on the ionizing/displacement synergistic effects in the lateral PNP bipolar transistor. The individual and mixed irradiation experiments of gamma rays and neutrons are accomplished on the transistors. The common emitter current gain, gate sweep characteristics and sub-threshold sweep characteristics are measured after each exposure. The results indicate that under the sequential irradiation of gamma rays and neutrons, the response of the gate-controlled lateral PNP bipolar transistor does exhibit ionizing/displacement synergistic effects and base current degradation is more severe than the simple artificial sum of those under the individual gamma and neutron irradiation. Enough attention should be paid to this phenomenon in radiation damage evaluation.

  5. Demonstration and properties of a planar heterojunction bipolar transistor with lateral current flow

    NASA Astrophysics Data System (ADS)

    Thornton, Robert L.; Mosby, William J.; Chung, Harlan F.

    1989-10-01

    The authors present fabrication techniques and device performance for a novel transistor structure, the lateral heterojunction bipolar transistor. The lateral heterojunctions are formed by impurity-induced disordering of a GaAs base layer sandwiched between two AlGaAs layers. These transistor structures exhibit current gains of 14 for base widths of 0.74 micron. Transistor action in this device occurs parallel to the surface of the device structure. The active base region of the structure is completely submerged, resulting in a reduction of surface recombination as a mechanism for gain reduction in the device. Impurity-induced disordering is used to widen the bandgap of the alloy in the emitter and collector, resulting in an improvement of the emitter injection efficiency. Since the device is based entirely on a surface diffusion process, the device is completely planar and has no steps involving etching of the III-V alloy material. These advantages lead this device to be considered as a candidate for optoelectronic integration applications. The transistor device functions as a buried heterostructure laser, with a threshold current as low as 6 mA for a 1.4-micron stripe.

  6. Efficient far-infrared thermal bremsstrahlung radiation from a heterojunction bipolar transistor

    SciTech Connect

    Chung, Pei-Kang; Yen, Shun-Tung

    2015-08-28

    We investigate the far-infrared thermal radiation properties of a heterojunction bipolar transistor. The device conveniently provides a high electric field for electrons to heat the lattice and the electron gas in a background with ions embedded. Because of very high effective temperature of the electron gas in the collector, the electron-ion bremsstrahlung makes efficient the thermal radiation in the far-infrared region. The transistor can yield a radiation power of 0.1 mW with the spectral region between 2 and 75 THz and a power conversion efficiency of 6 × 10{sup −4}. Such output contains a power of 20 μW in the low-frequency part (2–20 THz) of the spectrum.

  7. Tunnel diode collector contact in InP based PNP heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Shamir, N.; Ritter, D.; Cytermann, C.

    2002-06-01

    A tunnel diode collector contact to InP based PNP heterojunction bipolar transistors (HBTs) is suggested and demonstrated. The additional heavily doped n-type contact layer replaces the thick p-type contact layer required in conventional structures. The thermal and electrical properties of the collector contact layer thus become similar to those of NPN HBTs. A secondary ion mass spectroscopy study explores the maximum tin doping level that can be obtained in the base. Finally, the temperature dependence of the current gain is presented and interpreted.

  8. T-shaped emitter metal heterojunction bipolar transistors for submillimeter wave applications

    NASA Technical Reports Server (NTRS)

    Fung, Andy; Samoska, Lorene; Velebir, Jim; Siege, Peter; Rodwell, Mark; Paidi, Vamsi; Griffth, Zach; Urteaga, Miguel; Malik, Roger

    2004-01-01

    We report on the development of submillimeter wave transistors at JPL. The goal of the effort is to produce advance-reliable high frequency and high power amplifiers, voltage controlled oscillators, active multipliers, and high-speed mixed-signal circuits for space borne applications. The technology in development to achieve this is based on the Indium Phosphide (InP) Heterojunction Bipolar Transistor (HBT). The HBT is well suited for high speed, high power and uniform (across wafer) performance, due to the ability to tailor the material structure that electrons traverse through by well-controlled epitaxial growth methods. InP with its compatible lattice matched alloys such as indium gallium arsenide (InGaAs) and indium aluminium arsenide (InAlAs) provides for high electron velocities and high voltage breakdown capabilities. The epitaxial methods for this material system are fairly mature, however the implementation of high performance and reliable transistors are still under development by many laboratories. Our most recently fabricated, second generation mesa HBTs at JPL have extrapolated current gain cutoff frequency (FJ of 142GHz and power gain cutoff frequency (Fm,) of approximately 160GHz. This represents a 13% and 33% improvement of Ft and F, respectively, compared to the first generation mesa HBTs [l]. Analysis based on the University of California, Santa Barbara (UCSB) device model, RF device characteristics can be significantly improved by reducing base contact resistance and base metal contact width. We will describe our effort towards increasing transistor performance and yield.

  9. Bipolar redox behaviour, field-effect mobility and transistor switching of the low-molecular azo glass AZOPD.

    PubMed

    Arlt, Michael; Scheffler, Ayna; Suske, Irina; Eschner, Michael; Saragi, Tobat P I; Salbeck, Josef; Fuhrmann-Lieker, Thomas

    2010-11-07

    We present electrochemical and spectroelectrochemical data for the bipolar azo compound N,N'-diphenyl-N,N'-bis[4-(phenylazo)phenyl]-4,4'diaminobiphenyl (AZOPD) demonstrating reversible bipolar redox behaviour with a bandgap of 2.1 eV. The reduced species formed upon two-electron transfer can be described as bis(radical anion) as was confirmed by comparison with a reference compound with only one azo chromophore. Hole and electron transport behaviour in amorphous films was demonstrated by the fabrication of organic field-effect transistors using gold and magnesium contacts, respectively. The transistors are sensitive to light due to E-Z photoisomerization.

  10. Cryogenic Preamplification of a Single-Electron-Transistor using a Silicon-Germanium Heterojunction-Bipolar-Transistor

    DOE PAGES

    Curry, Matthew J.; England, Troy Daniel; Bishop, Nathaniel; ...

    2015-05-21

    We examine a silicon-germanium heterojunction bipolar transistor (HBT) for cryogenic pre-amplification of a single electron transistor (SET). The SET current modulates the base current of the HBT directly. The HBT-SET circuit is immersed in liquid helium, and its frequency response from low frequency to several MHz is measured. The current gain and the noise spectrum with the HBT result in a signal-to-noise-ratio (SNR) that is a factor of 10–100 larger than without the HBT at lower frequencies. Furthermore, the transition frequency defined by SNR = 1 has been extended by as much as a factor of 10 compared to withoutmore » the HBT amplification. The power dissipated by the HBT cryogenic pre-amplifier is approximately 5 nW to 5 μW for the investigated range of operation. We found that the circuit is also operated in a single electron charge read-out configuration in the time-domain as a proof-of-principle demonstration of the amplification approach for single spin read-out.« less

  11. Cryogenic preamplification of a single-electron-transistor using a silicon-germanium heterojunction-bipolar-transistor

    SciTech Connect

    Curry, M. J.; England, T. D.; Bishop, N. C.; Ten-Eyck, G.; Wendt, J. R.; Pluym, T.; Lilly, M. P.; Carroll, M. S.; Carr, S. M.

    2015-05-18

    We examine a silicon-germanium heterojunction bipolar transistor (HBT) for cryogenic pre-amplification of a single electron transistor (SET). The SET current modulates the base current of the HBT directly. The HBT-SET circuit is immersed in liquid helium, and its frequency response from low frequency to several MHz is measured. The current gain and the noise spectrum with the HBT result in a signal-to-noise-ratio (SNR) that is a factor of 10–100 larger than without the HBT at lower frequencies. The transition frequency defined by SNR = 1 has been extended by as much as a factor of 10 compared to without the HBT amplification. The power dissipated by the HBT cryogenic pre-amplifier is approximately 5 nW to 5 μW for the investigated range of operation. The circuit is also operated in a single electron charge read-out configuration in the time-domain as a proof-of-principle demonstration of the amplification approach for single spin read-out.

  12. Cryogenic Preamplification of a Single-Electron-Transistor using a Silicon-Germanium Heterojunction-Bipolar-Transistor

    SciTech Connect

    Curry, Matthew J.; England, Troy Daniel; Bishop, Nathaniel; Ten Eyck, Gregory A.; Wendt, Joel R.; Pluym, Tammy; Lilly, Michael; Carr, Stephen M; Carroll, Malcolm S.

    2015-05-21

    We examine a silicon-germanium heterojunction bipolar transistor (HBT) for cryogenic pre-amplification of a single electron transistor (SET). The SET current modulates the base current of the HBT directly. The HBT-SET circuit is immersed in liquid helium, and its frequency response from low frequency to several MHz is measured. The current gain and the noise spectrum with the HBT result in a signal-to-noise-ratio (SNR) that is a factor of 10–100 larger than without the HBT at lower frequencies. Furthermore, the transition frequency defined by SNR = 1 has been extended by as much as a factor of 10 compared to without the HBT amplification. The power dissipated by the HBT cryogenic pre-amplifier is approximately 5 nW to 5 μW for the investigated range of operation. We found that the circuit is also operated in a single electron charge read-out configuration in the time-domain as a proof-of-principle demonstration of the amplification approach for single spin read-out.

  13. InGaP/InGaAsN/GaAs NpN double heterojunction bipolar transistor

    SciTech Connect

    Chang, P.C.; Baca, A.G.; Li, N.Y.; Xie, X.M.; Sharps, P.R.; Hou, H.Q.

    2000-01-10

    The authors have demonstrated a functional NpN double heterojunction bipolar transistor (DHBT) using InGaAsN for base layer. The InGaP/In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01}/GaAs DHBT has a low V{sub ON} of 0.81 V, which is 0.13 V lower than in a InGaP/GaAs HBT. The lower V{sub ON} is attributed to the smaller bandgap (E{sub g}=1.20eV) of MOCVD grown In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01} base layer. GaAs is used for the collector; thus the BV{sub CEO} is 10 V, consistent with the BV{sub CEO} of InGaP/GaAs Hbts of comparable collector thickness and doping level. To alleviate the current blocking phenomenon caused by the larger {triangle}E{sub C} between InGaAsN and GaAs, a graded InGaAs layer with {delta}-doping is inserted at the base-collector junction. The improved device has a peak current gain of 7 with ideal IV characteristics.

  14. Ultrahigh Performance Staggered Lineup (“Type-II”) InP/GaAsSb/InP NpN Double Heterojunction Bipolar Transistors

    NASA Astrophysics Data System (ADS)

    Bolognesi, Colombo R.; Dvorak, Martin W.; Matine, Noureddine; Pitts, Oliver J.; Watkins, Simon P.

    2002-02-01

    We study the performance of staggered lineup NpN InP/GaAsSb/InP abrupt double heterojunction bipolar transistors (DHBTs) intended for ultrahigh speed applications. With a peak fT of 305 GHz (and fMAX=300 GHz), InP/GaAsSb/InP DHBTs are currently the fastest bipolar transistors ever implemented, and as such may challenge sub-100 nm gate InP HEMTs for > 40 Gb/s applications: previously published criteria suggest current device performance should be suitable for 80-100 Gb/s OEICs. InP/GaAsSb/InP DHBTs feature high breakdown voltages and low offset and knee voltages, and extremely high current drive levels enabled by the lack of collector current blocking at the staggered base/collector junction. InP/GaAsSb/InP DHBTs also feature important manufacturability advantages because the structure is entirely made up of uniform composition binary and ternary alloy layers.

  15. A high performance charge plasma based lateral bipolar transistor on selective buried oxide

    NASA Astrophysics Data System (ADS)

    Loan, Sajad A.; Bashir, Faisal; Rafat, M.; Rehman Alamoud, Abdul; Abbasi, Shuja A.

    2014-01-01

    In this paper, we present a new structure of lateral bipolar transistor on selective buried oxide. The device does not use highly doped regions; however, it employs the concept of creating n and p type charge plasma in undoped silicon by using metal electrodes of different work functions. The proposed device is named as the selective buried oxide based bipolar charge plasma transistor (SELBOX-BCPT). An extensive 2D simulation study has revealed that the proposed SELBOX-BCPT device not only possesses all the advantages of the conventional BCPT device, but it also addresses various severe problems of the BCPT device. A significant improvement in major issues of poor cutoff frequency (fT), low breakdown voltage and thermal efficiency has been achieved. It has been observed that the fT has increased by ∼94.6%, the breakdown voltage by 23.47% and the device is much cooler than the conventional BCPT device. A large current gain is obtained in the proposed device and is on a par with the conventional BCPT device. Further, by using mixed-mode simulation feature of the Atlas simulator, inverting amplifiers based on SELBOX-BCPT and the conventional BCPT have been realized. A significant improvement of 15% in switching-on transient time and 25.8% in switching-off transient time has been achieved in the proposed device in comparison to the conventional BCPT device.

  16. The 6.5 kV clustered insulated gate bipolar transistor in homogeneous base technology

    NASA Astrophysics Data System (ADS)

    Luther-King, N.; Sweet, M.; Spulber, O.; Vershinin, K.; Ngw, C. K.; Bose, S. C.; De Souza, M. M.; Sankara Narayanan, E. M.

    2001-01-01

    The aim of this paper is to evaluate the performance of a new power semiconductor device called the clustered insulated gate bipolar transistor (CIGBT) in the homogeneous base (HB) technology for high power applications. The CIGBT belongs to a new family of MOS controlled power devices with thyristor mode of operation in the on-state and current saturation characteristics even at high gate biases. The saturation characteristics are achieved through a unique 'self-clamping' phenomenon at a predetermined anode voltage. This inherent feature enables a wide FBSOA and low loss during switching. Our detailed analysis of the CIGBT using a 2-D mixed device-circuit simulation tool indicates that 525 μm of lightly doped silicon is adequate to block 6.5 kV in the HB technology. The thin substrate improves the trade-off between conduction and switching losses even further. With an on-state voltage drop as low as 2 V at 30 A cm -2 and 3.1 V at 100 A cm -2 the device is able to turn off under inductive switching conditions at a 3 kV line voltage, with significantly low energy losses in comparison to an optimised homogeneous base insulated gate bipolar transistor (HB-IGBT). Further, the device shows good short circuit withstand capability and its positive temperature coefficient of the forward voltage drop eases parallel integration.

  17. Effect of doping and stoichiometric profile on transport in SiGe heterojunction bipolar transistor

    NASA Astrophysics Data System (ADS)

    Halilov, S.

    2016-09-01

    Based on analytical consideration and numerical simulations, it is shown how the mutually adjusted doping and stoichiometric profile results in improved frequency response and current gain in Si1-x Ge x -based heterojunction bipolar transistor. The closed-form expressions are derived for the dopant distribution within a certain mobility model which is parametrized in terms of the impurity concentration and stoichiometric grading on the same footing. With proper parametrization of the mobility, the method is suitable in both limits of high alloy scattering/low crystal ordering and low alloy scattering/highly ordered stoichiometrically graded structure. The work is corroborated by device simulations of a single-side HBT 30% stoichiometrically graded base, with detailed IV-curve, Gummel and AC analysis. It is shown that the distinct impurity distribution results in a reduced space-charge region, contributes to an effective electric field assisting the diffusion of the minority carriers and results in the saturation current density increased by 50%, the AC gain increased by 90%, the four-fold increase of the DC current gain, and improves the transition frequency from 274 to 358 GHz as compared to the case of the uniformly distributed acceptors. The obtained results may serve as a practical guide in design of highly-graded heterojunction bipolar transistors with efficient frequency response, high gain and enhanced power.

  18. Fabrication and high temperature characteristics of ion-implanted GaAs bipolar transistors and ring-oscillators

    NASA Technical Reports Server (NTRS)

    Doerbeck, F. H.; Yuan, H. T.; Mclevige, W. V.

    1981-01-01

    Ion implantation techniques that permit the reproducible fabrication of bipolar GaAs integrated circuits are studied. A 15 stage ring oscillator and discrete transistor were characterized between 25 and 400 C. The current gain of the transistor was found to increase slightly with temperature. The diode leakage currents increase with an activation energy of approximately 1 eV and dominate the transistor leakage current 1 sub CEO above 200 C. Present devices fail catastrophically at about 400 C because of Au-metallization.

  19. Performance Limiting Defects in SiC Based Transistors

    DTIC Science & Technology

    2006-11-01

    1 PERFORMANCE LIMITING DEFECTS IN SIC BASED TRANSISTORS P.M. Lenahan*, M.S. Dautrich, C.J. Cochrane, Pennsylvania State University University...oxide semiconductor field effect transistors (MOSFETs) and SiC based bipolar junction transistors (BJTs). The focus has been upon those defects which...of transistors (Lenahan, Jupina, 1990). SDR exploits the fact that recombination in semiconductors is spin dependent (Lepine, 1972; Kaplan et al

  20. Comparison of 1/f noise in complementary NPN and PNP polysilicon emitter bipolar transistors

    NASA Astrophysics Data System (ADS)

    Ul Hoque, Md M.; Celik-Butler, Zeynep; Trogolo, Joe; Weiser, Douglas; Green, Keith

    2005-05-01

    1/f noise was investigated in a complementary polysilicon emitter bipolar process. Noise measurements were carried out for variable base bias resistance (RS) to analyze how the contribution of each noise source changes as RS is varied. Two noise measurement setups were used to identify different noise sources in the transistors: noise from the base current (SIB), collector current (SIC), and internal resistances (SVr). The coherence for transistors measured in both measurement setups were close to unity, implying a single dominant noise source. SIB had the dominant contribution at lower bias currents. In this case, RS was relatively larger than the input resistance of the transistor. Higher current measurements with a smaller RS showed a dominant contribution from SVr. SIB was modeled as a combination of the minority carrier diffusion fluctuations in the monosilicon and polysilicon emitter, and tunneling fluctuations through the interfacial oxide. A combination of the number and diffusion fluctuations of the minority carriers in the base was used to model SIC. It was concluded that mainly originates from the fluctuations in the internal emitter resistance, which was ascribed to the tunneling fluctuations of the majority carriers through the interfacial oxide.

  1. Maximizing ion current rectification in a bipolar conical nanopore fluidic diode using optimum junction location.

    PubMed

    Singh, Kunwar Pal

    2016-10-12

    The ion current rectification has been obtained as a function of the location of a heterojunction in a bipolar conical nanopore fluidic diode for different parameters to determine the junction location for maximum ion current rectification using numerical simulations. Forward current peaks for a specific location of the junction and reverse current decreases with the junction location due to a change in ion enrichment/depletion in the pore. The optimum location of the heterojunction shifts towards the tip with base/tip diameter and surface charge density, and towards the base with the electrolyte concentration. The optimum location of the heterojunction has been approximated by an equation as a function of pore length, base/tip diameter, surface charge density and electrolyte concentration. The study is useful to design a rectifier with maximum ion current rectification for practical purposes.

  2. Analysis of the thin-film SOI lateral bipolar transistor and optimization of its output characteristics for high-temperature applications

    NASA Astrophysics Data System (ADS)

    Adriaensen, S.; Flandre, D.

    2002-09-01

    In this paper, we investigate and optimize the static characteristics of NPN lateral bipolar transistors implemented in a thin-film fully-depleted SOI CMOS process for high-temperature analog applications. The basic lateral SOI bipolar device, which shows good behaviour in high-temperature circuits in spite of its relatively poor performances, is firstly described regarding its process and layout parameters. Then the concept of the graded-base bipolar transistor is introduced. This device presents significantly improved output characteristics while preserving standard current gain and CMOS process compatibility. Measurements and simulations are used to demonstrate the improvements of the breakdown voltage and the Early voltage of the bipolar device.

  3. SiGe:C Heterojunction Bipolar Transistors: From Materials Research to Chip Fabrication

    NASA Astrophysics Data System (ADS)

    Ruecker, H.; Heinemann, B.; Knoll, D.; Ehwald, K.-E.

    Incorporation of substitutional carbon ( ~10^20 cm^-3) into the SiGe region of a heterojunction bipolar transistor (HBT) strongly reduces boron diffusion during device processing. We describe the physical mechanism behind the suppression of B diffusion in C-rich Si and SiGe, and explain how the increased thermal stability of doping profiles in SiGe:C HBTs can be used to improve device performance. Manufacturability of SiGe:C HBTs with transit frequencies of 100 GHz and maximum oscillation frequencies of 130 GHz is demonstrated in a BiCMOS technology capable of fabricating integrated circuits for radio frequencies with high yield.

  4. A high-conductivity insulated gate bipolar transistor with Schottky hole barrier contact

    NASA Astrophysics Data System (ADS)

    Mengxuan, Jiang; John, Shen Z.; Jun, Wang; Xin, Yin; Zhikang, Shuai; Jiang, Lu

    2016-02-01

    This letter proposes a high-conductivity insulated gate bipolar transistor (HC-IGBT) with Schottky contact formed on the p-base, which forms a hole barrier at the p-base side to enhance the conductivity modulation effect. TCAD simulation shows that the HC-IGBT provides a current density increase by 53% and turn-off losses decrease by 27% when compared to a conventional field-stop IGBT (FS-IGBT). Hence, the proposed IGBT exhibits superior electrical performance for high-efficiency power electronic systems. Project supported by the National High Technology Research and Development Program of China (No. 2014AA052601) and the National Natural Science Foundation of China (No. 51277060).

  5. Characterization of insulated-gate bipolar transistor temperature on insulating, heat-spreading polycrystalline diamond substrate

    NASA Astrophysics Data System (ADS)

    Umezawa, Hitoshi; Shikata, Shin-ichi; Kato, Yukako; Mokuno, Yoshiaki; Seki, Akinori; Suzuki, Hiroshi; Bessho, Takeshi

    2017-01-01

    Polycrystalline diamond films have been utilized as direct bonding aluminum (DBA) substrates to improve cooling efficiency. A diamond film with a high quality factor was characterized by Raman spectroscopy and showed a high thermal conductivity of more than 1800 W m-1 K-1 and a low leakage current, even at an applied bias of 3 kV, because of the suppression of electrical conduction through the grain boundaries. The operating temperatures of Insulated-gate bipolar transistors (IGBTs) on diamond DBAs were 20-28% lower than those on AlN DBAs. The thermal resistivity of the diamond DBA module was 0.32 °C/W. The uniformity of the temperature distribution on a diamond DBA was excellent.

  6. Analysis of long-term ionizing radiation effects in bipolar transistors

    NASA Technical Reports Server (NTRS)

    Stanley, A. G.; Martin, K. E.

    1978-01-01

    The ionizing radiation effects of electrons on bipolar transistors have been analyzed using the data base from the Voyager project. The data were subjected to statistical analysis, leading to a quantitative characterization of the product and to data on confidence limits which will be useful for circuit design purposes. These newly-developed methods may form the basis for a radiation hardness assurance system. In addition, an attempt was made to identify the causes of the large variations in the sensitivity observed on different product lines. This included a limited construction analysis and a determination of significant design and processes variables, as well as suggested remedies for improving the tolerance of the devices to radiation.

  7. Microwave characterization and modeling of GaAs/AlGaAs heterojunction bipolar transistors

    NASA Technical Reports Server (NTRS)

    Simons, Rainee N.; Romanofsky, Robert R.

    1987-01-01

    The characterization and modeling of a microwave GaAs/AlGaAs heterojunction Bipolar Transistor (HBT) are discussed. The de-embedded scattering parameters are used to derive a small signal lumped element equivalent circuit model using EEsof's Touchstone software package. Each element in the equivalent circuit model is shown to have its origin within the device. The model shows good agreement between the measured and modeled scattering parameters over a wide range of bias currents. Further, the MAG (maximum available power gain) and the h sub 21 (current gain) calculated from the measured data and those predicted by the model are also in good agreement. Consequently, the model should also be capable of predicting the f sub max and the f sub T of other HBTs.

  8. Radiative recombination in GaN/InGaN heterojunction bipolar transistors

    SciTech Connect

    Kao, Tsung-Ting; Lee, Yi-Che; Kim, Hee-Jin; Ryou, Jae-Hyun; Kim, Jeomoh; Detchprohm, Theeradetch; Dupuis, Russell D.; Shen, Shyh-Chiang

    2015-12-14

    We report an electroluminescence (EL) study on npn GaN/InGaN heterojunction bipolar transistors (HBTs). Three radiative recombination paths are resolved in the HBTs, corresponding to the band-to-band transition (3.3 eV), conduction-band-to-acceptor-level transition (3.15 eV), and yellow luminescence (YL) with the emission peak at 2.2 eV. We further study possible light emission paths by operating the HBTs under different biasing conditions. The band-to-band and the conduction-band-to-acceptor-level transitions mostly arise from the intrinsic base region, while a defect-related YL band could likely originate from the quasi-neutral base region of a GaN/InGaN HBT. The I{sub B}-dependent EL intensities for these three recombination paths are discussed. The results also show the radiative emission under the forward-active transistor mode operation is more effective than that using a diode-based emitter due to the enhanced excess electron concentration in the base region as increasing the collector current increases.

  9. Effect of ultrathin AlN spacer on electronic properties of GaN/SiC heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Miyake, Hiroki; Kimoto, Tsunenobu; Suda, Jun

    2014-03-01

    GaN/SiC heterojunction bipolar transistors (HBTs) with an ultrathin AlN spacer layer at the n-GaN/p-SiC emitter junction are proposed for the control of the electronic properties of GaN/SiC heterojunctions. The insertion of an AlN spacer is found to be promising in terms of improving electron injection efficiency owing to the reduced potential barrier (0.54 eV) to electron injection and reduced recombination via interface traps. We also investigated the effect of pre-irradiation of active nitrogen atoms (N*) prior to AlN growth for the control of the electronic properties of GaN/AlN/SiC heterojunctions. We found that the potential barrier was further reduced to 0.46 eV by N* pre-irradiation. The HBT structure was successfully fabricated using our newly developed process featuring ion implantation and Pd ohmic contacts to obtain a low contact resistivity to a p-SiC base at a temperature as low as 600 °C. A fabricated HBT without an AlN layer showed a low current gain (α ˜ 0.001), whereas the GaN/AlN/SiC HBT showed improved current gains of 0.1 in the case of using a 1-nm-thick AlN spacer without N* pre-irradiation and 0.2 in the case of using a 2-nm-thick AlN spacer with N* pre-irradiation.

  10. Soft-switching performance analysis of the clustered insulated gate bipolar transistor (CIGBT)

    NASA Astrophysics Data System (ADS)

    Nicholls, Jonathan Christopher

    The use of Insulated Gate Bipolar Transistors (IGBT) have enabled better switching performance than the Metal Oxide Semiconductor Field effect Transistor (MOSFET) in medium to high power applications due to their lower on-state power loss and higher current densities. This current research focuses on the Clustered Insulated Gate Bipolar Transistor (CIGBT) whilst being operated under soft-switching regimes. The CIGBT is a MOS gated thyristor device that exhibits a unique self-clamping feature that protects cathode cells from high anode voltages under all operating conditions. The self-clamping feature also enables current saturation at high gate biases and provides low switching losses. Its low on-state voltage and high voltage blocking capabilities make the CIGBT suitable as a contender to the IGBT in medium to high power switching applications. For the first time, the CIGBT has been operated under soft-switching regimes and transient over-voltages at turn-on have been witnessed which have been found to be associated with a number of factors.. The internal dynamics of the CIGBT have been analysed using 2D numerical simulations and it has been shown that a major influence on the peak voltage is the P well spacing within the CIGBT structure. For example, Small adjacent P well spacings within the device results in an inability for the CIGBT to switch iv on correctly. Further to this, implant concentrations of the n well region during device fabrication can also affect the turn-on transients. Despite this, the CIGBT has been experimental analysed under soft-switching conditions and found to outperform the IGBT by 12% and 27% for on-state voltage drop and total energy losses respectively. Turn off current bumps have been seen whilst switching the device in zero voltage and zero current switching mode of operation and the internal dynamics have been analysed to show the influence upon the current at turn off. Preliminary results on the Trench CIGBT (TCIGBT) under soft

  11. Investigation and Application of Neutron Damage to Bipolar Transistors in Light Water Reactor Dosimetry.

    NASA Astrophysics Data System (ADS)

    Roknizadeh, Mansour

    A method of fast neutron metrology and a basis for prediction of changes in performance parameters of semiconductor devices in power plant radiation environments has been established using Cf-252 sources. Three general purpose NPN bipolar transistors (PN2222A, ECG-196, and ECG-184) were chosen as the neutron damage monitors and the change in inverse d.c. current gain before and after irradiation was chosen as the damage parameter for the measurement. The ECG-196 and ECG-184 transistors have been calibrated for neutron fluences ranging from 1.0E10 n(1MeV)/ {rm cm}^2 to 1.0E12 n(1MeV)/{rm cm}^2. PN2222A transistors have been calibrated for neutron fluences ranging from 1.0E12 to 2.0E15 n(1MeV)/cm^2 . The main findings of the investigation were as follows:. The change in inverse d.c. current gain for PN2222A transistors was approximately a linear function of the neutron fluence up to 2.0E15 n(1MeV)/{rm cm}^2. The departure from linearity has been represented by a quadratic function. The concept of 1-MeV equivalent neutron fluence which characterizes an incident energy-fluence spectrum in terms of the fluence of monoenergetic neutrons at 1 MeV, is in error for application to common transistors in a typical power plant environment. This has been proven to be due to the fact that low energy neutron effects are not correctly accounted for when using the silicon displacement kerma to calculate 1-MeV equivalent neutron fluence. Therefore, a model has been developed by which the damage response is corrected in order to account for the low energy neutron effects. The normalized damage coefficient which is the ratio of damage to 1-MeV equivalent neutron fluence divided by the measured base transit time of individual transistors, for all three types of transistors is nearly the same with an average value of 1.27E - 7 +/- 15.0% {rm cm}^2 /m(1MeV).Sec. This supports the theory that base transit time is a parameter from which the neutron vulnerability in a nuclear radiation

  12. Effect of temperature on the performance of a bipolar transistor carrier-injected optical waveguide modulator/switch.

    PubMed

    Okada, Y

    1991-05-15

    The effect of ambient temperature on the performance of a GaAs/AlGaAs heterojunction bipolar transistor waveguide structure carrier-injected optical intensity modulator/switch is discussed. An increase in the temperature increases the achievable optical modulation ratio at the expense of increased absorption loss, and vice versa. Analysis also shows that for practical use a tolerable temperature change should be no more than approximately 10 degrees C.

  13. Tunnel Field-Effect Transistor with Epitaxially Grown Tunnel Junction Fabricated by Source/Drain-First and Tunnel-Junction-Last Processes

    NASA Astrophysics Data System (ADS)

    Morita, Yukinori; Mori, Takahiro; Migita, Shinji; Mizubayashi, Wataru; Tanabe, Akihito; Fukuda, Koichi; Masahara, Meishoku; Ota, Hiroyuki

    2013-04-01

    We fabricate p- and n-channel Si tunnel field-effect transistors (TFETs) with an epitaxially grown tunnel junction. In a novel source/drain-first and tunnel-junction-last fabrication process, a thin epitaxial undoped Si channel (epichannel) is deposited on a preferentially fabricated p- or n-type source area. The epichannel sandwiched by a gate insulator and a highly doped source well acts as a parallel-plate tunnel capacitor, which effectively multiplies drain current with an enlarged tunnel area. On the basis of its simple structure and easy fabrication, symmetric n- and p-transistor and complementary metal oxide semiconductor inverter operations were successfully demonstrated.

  14. Pure valley- and spin-entangled states in a MoS2-based bipolar transistor

    NASA Astrophysics Data System (ADS)

    Bai, Chunxu; Zou, Yonglian; Lou, Wen-Kai; Chang, Kai

    2014-11-01

    In this study, we show that the local Andreev reflection not only can be tuned largely by the type of the normal metal electrode, it also is related to the electrostatic potential in the superconductor region in a MoS2-based n (p ) -type metal/superconductor junction. In a MoS2-based n -type metal/n (p ) -type superconductor/p -type metal (n Sp ) transistor, nonlocal pure valley- and spin-entangled current can be tuned by the length and local gate voltage of a superconductor region. In particular, switching the quasiparticle type in both structures results in a series of intriguing features. Such an effect is not attainable in a graphene-based junction where the electron-hole symmetry enables the symmetry results to be observed. Besides, we have shown that the crossed Andreev reflection exhibits a maximum around ξ /2 instead of the exponential decay behavior in conventional superconductors and a maximum around ξ in the graphene material. The proposed straightforward experimental design and pure valley- and spin-entangled state can pave the way for a wider use in the entanglement based on material group-VI dichalcogenides.

  15. Giant amplification of tunnel magnetoresistance in a molecular junction: Molecular spin-valve transistor

    SciTech Connect

    Dhungana, Kamal B.; Pati, Ranjit

    2014-04-21

    Amplification of tunnel magnetoresistance by gate field in a molecular junction is the most important requirement for the development of a molecular spin valve transistor. Herein, we predict a giant amplification of tunnel magnetoresistance in a single molecular spin valve junction, which consists of Ru-bis-terpyridine molecule as a spacer between two ferromagnetic nickel contacts. Based on the first-principles quantum transport approach, we show that a modest change in the gate field that is experimentally accessible can lead to a substantial amplification (320%) of tunnel magnetoresistance. The origin of such large amplification is attributed to the spin dependent modification of orbitals at the molecule-lead interface and the resultant Stark effect induced shift in channel position with respect to the Fermi energy.

  16. Prospects of bipolar diamond devices

    NASA Astrophysics Data System (ADS)

    Aleksov, A.; Denisenko, A.; Kohn, E.

    2000-02-01

    The prospects of diamond bipolar devices are analysed theoretically and experimentally in respect to the problem of deep doping, especially the deep donor in diamond. For this purpose a set of p- n- p bipolar junction transistors (BJTs) is fabricated on p-type diamond substrates by epitaxial growth using boron ( EA=0.4 eV) and nitrogen ( ED=1.7 eV) as the p- and n-type dopants respectively. It is shown that at the boron/nitrogen junction a p- n junction is formed. The built-in potential of the junction is determined by the ionised boron/nitrogen impurities. The specific features of the fabricated devices are the high resistivity of the nitrogen doped base (10 GΩ·cm at 20°C) and a significant leakage current of the reverse biased p- n junctions. These factors limit the transistor action to d.c.-operation in the nA-current range and to temperatures below 200°C where leakage starts to dominate. The values of the static current gain IC/ IB are measured in the common base mode 200 and in the common emitter mode 1.1. The theoretical section of the paper deals with the calculation of the static current gain of diamond pnp transistor structures in dependence of the donor energy level, temperature and frequency. Both the theoretical and the experimental results indicate that diamond bipolar transistors with a nitrogen doped n-type base can exhibit a current gain β of up to 30,000 in the d.c.-regime provided the leakage of the p- n junctions is sufficiently low. High-gain diamond transistors operating in GHz-frequency can be expected as soon as n-doping by shallow donor like phosphorous ( ED<0.5 eV) becomes available.

  17. Multi-level interconnects for heterojunction bipolar transistor integrated circuit technologies

    SciTech Connect

    Patrizi, G.A.; Lovejoy, M.L.; Schneider, R.P. Jr.; Hou, H.Q.; Enquist, P.M.

    1995-12-31

    Heterojunction bipolar transistors (HBTs) are mesa structures which present difficult planarization problems in integrated circuit fabrication. The authors report a multilevel metal interconnect technology using Benzocyclobutene (BCB) to implement high-speed, low-power photoreceivers based on InGaAs/InP HBTs. Processes for patterning and dry etching BCB to achieve smooth via holes with sloped sidewalls are presented. Excellent planarization of 1.9 {micro}m mesa topographies on InGaAs/InP device structures is demonstrated using scanning electron microscopy (SEM). Additionally, SEM cross sections of both the multi-level metal interconnect via holes and the base emitter via holes required in the HBT IC process are presented. All via holes exhibit sloped sidewalls with slopes of 0.4 {micro}m/{micro}m to 2 {micro}m/{micro}m which are needed to realize a robust interconnect process. Specific contact resistances of the interconnects are found to be less than 6 {times} 10{sup {minus}8} {Omega}cm{sup 2}. Integrated circuits utilizing InGaAs/InP HBTs are fabricated to demonstrate the applicability and compatibility of the multi-level interconnect technology with integrated circuit processing.

  18. Bipolar-power-transistor-based limiter for high frequency ultrasound imaging systems

    PubMed Central

    Choi, Hojong; Yang, Hao-Chung; Shung, K. Kirk

    2013-01-01

    High performance limiters are described in this paper for applications in high frequency ultrasound imaging systems. Limiters protect the ultrasound receiver from the high voltage (HV) spikes produced by the transmitter. We present a new bipolar power transistor (BPT) configuration and compare its design and performance to a diode limiter used in traditional ultrasound research and one commercially available limiter. Limiter performance depends greatly on the insertion loss (IL), total harmonic distortion (THD) and response time (RT), each of which will be evaluated in all the limiters. The results indicated that, compared with commercial limiter, BPT-based limiter had less IL (–7.7 dB), THD (–74.6 dB) and lower RT (43 ns) at 100MHz. To evaluate the capability of these limiters, they were connected to a 100 MHz single element transducer and a two-way pulse-echo test was performed. It was found that the -6 dB bandwidth and sensitivity of the transducer using BPT-based limiter were better than those of the commercial limiter by 22 % and 140 %, respectively. Compared to the commercial limiter, BPT-based limiter is shown to be capable of minimizing signal attenuation, RT and THD at high frequencies and is thus suited for high frequency ultrasound applications. PMID:24199954

  19. Solution-processible organic-inorganic hybrid bipolar field-effect transistors

    NASA Astrophysics Data System (ADS)

    Chae, Gil Jo; Kim, Kang Dae; Cho, Shinuk; Walker, Bright; Seo, Jung Hwa

    2016-04-01

    Organic-inorganic hybrid bipolar field-effect transistors (HBFETs) comprising a layer of p-type organic poly(3-hexylthiophene) (P3HT) separated from a parallel layer of n-type inorganic zinc oxide (ZnO) were demonstrated by solution processing. In order to achieve balanced hole and electron mobilities, we initially optimized the hole-transporting P3HT channel by the addition of the polar non-solvent acetonitrile (AN) to P3HT solutions in chloroform, which induced a selfassembled nano-fibril morphology and an enhancement of hole mobilities. For the electron channel, a wet-chemically-prepared ZnO layer was optimized by thermal annealing. Unipolar P3HT FET with 5% AN exhibited the highest hole mobility of 7.20 × 10-2 cm2V-1s-1 while the highest electron mobility (3.64 × 10-2 cm2V-1s-1) was observed in unipolar ZnO FETs annealed at 200°C. The organic-inorganic HBFETs consisting of the P3HT layer with 5% AN and ZnO annealed at 200°C exhibited well-balanced hole and electron mobilities of 1.94 × 10-2 cm2V-1s-1 and 1.98 × 10-2 cm2V-1s-1, respectively.

  20. GaAsP/InGaP heterojunction bipolar transistors grown by MOCVD

    NASA Astrophysics Data System (ADS)

    Heidelberger, Christopher; Fitzgerald, Eugene A.

    2017-01-01

    Heterojunction bipolar transistors with GaAsxP1-x bases and collectors and InyGa1-yP emitters were grown on GaAs substrates via metalorganic chemical vapor deposition, fabricated using conventional techniques, and electrically tested. Four different GaAsxP1-x compositions were used, ranging from x = 0.825 to x = 1 (GaAs), while the InyGa1-yP composition was adjusted to remain lattice-matched to the GaAsP. DC gain close to or exceeding 100 is measured for 60 μm diameter devices of all compositions. Physical mechanisms governing base current and therefore current gain are investigated. The collector current is determined not to be affected by the barrier caused by the conduction band offset between the InGaP emitter and GaAsP base. While the collector current for the GaAs/InGaP devices is well-predicted by diffusion of electrons across the quasi-neutral base, the collector current of the GaAsP/InGaP devices exceeds this estimate by an order of magnitude. This results in higher transconductance for GaAsP/InGaP than would be estimated from known material properties.

  1. InGaAsN/AlGaAs Pnp Heterojunction Bipolar Transistor

    SciTech Connect

    BACA,ALBERT G.; CHANG,PING-CHIH; HOU,H.Q.; LAROCHE,J.R.; LI,N.Y.; REN,F.; SHARPS,P.R.

    1999-11-03

    The authors have demonstrated a functional Pnp heterojunction bipolar transistor (HBT) using InGaAsN. The metalorganic vapor phase epitaxy (MOCVD) grown Al{sub 0.3}Ga{sub 0.7}As/In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01} HBT takes advantage of the narrower bandgap energy (E{sub g} = 1.25eV) of In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01}, which is lattice matched to GaAs. Compared with the Al{sub 0.3}Ga{sub 0.7}As/GaAs material system, the Al{sub 0.3}Ga{sub 0.7}As/In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01} material system has a larger conduction band offset, while the valence band offset remains comparable. This characteristic band alignment is very suitable for Pnp HBT applications. The device's peak current gain is 23 and it has a turn on voltage of 0.77V, which is 0.25V lower than in a comparable Pnp Al{sub 0.3}Ga{sub 0.7}As/GaAs HBT.

  2. Heat removal from bipolar transistor by loop heat pipe with nickel and copper porous structures.

    PubMed

    Nemec, Patrik; Smitka, Martin; Malcho, Milan

    2014-01-01

    Loop heat pipes (LHPs) are used in many branches of industry, mainly for cooling of electrical elements and systems. The loop heat pipe is a vapour-liquid phase-change device that transfers heat from evaporator to condenser. One of the most important parts of the LHP is the porous wick structure. The wick structure provides capillary force to circulate the working fluid. To achieve good thermal performance of LHP, capillary wicks with high permeability and porosity and fine pore radius are expected. The aim of this work was to develop porous structures from copper and nickel powder with different grain sizes. For experiment copper powder with grain size of 50 and 100 μm and nickel powder with grain size of 10 and 25 μm were used. Analysis of these porous structures and LHP design are described in the paper. And the measurements' influences of porous structures in LHP on heat removal from the insulated gate bipolar transistor (IGBT) have been made.

  3. Bipolar-power-transistor-based limiter for high frequency ultrasound imaging systems.

    PubMed

    Choi, Hojong; Yang, Hao-Chung; Shung, K Kirk

    2014-03-01

    High performance limiters are described in this paper for applications in high frequency ultrasound imaging systems. Limiters protect the ultrasound receiver from the high voltage (HV) spikes produced by the transmitter. We present a new bipolar power transistor (BPT) configuration and compare its design and performance to a diode limiter used in traditional ultrasound research and one commercially available limiter. Limiter performance depends greatly on the insertion loss (IL), total harmonic distortion (THD) and response time (RT), each of which will be evaluated in all the limiters. The results indicated that, compared with commercial limiter, BPT-based limiter had less IL (-7.7 dB), THD (-74.6 dB) and lower RT (43 ns) at 100 MHz. To evaluate the capability of these limiters, they were connected to a 100 MHz single element transducer and a two-way pulse-echo test was performed. It was found that the -6 dB bandwidth and sensitivity of the transducer using BPT-based limiter were better than those of the commercial limiter by 22% and 140%, respectively. Compared to the commercial limiter, BPT-based limiter is shown to be capable of minimizing signal attenuation, RT and THD at high frequencies and is thus suited for high frequency ultrasound applications.

  4. Heat Removal from Bipolar Transistor by Loop Heat Pipe with Nickel and Copper Porous Structures

    PubMed Central

    Smitka, Martin; Malcho, Milan

    2014-01-01

    Loop heat pipes (LHPs) are used in many branches of industry, mainly for cooling of electrical elements and systems. The loop heat pipe is a vapour-liquid phase-change device that transfers heat from evaporator to condenser. One of the most important parts of the LHP is the porous wick structure. The wick structure provides capillary force to circulate the working fluid. To achieve good thermal performance of LHP, capillary wicks with high permeability and porosity and fine pore radius are expected. The aim of this work was to develop porous structures from copper and nickel powder with different grain sizes. For experiment copper powder with grain size of 50 and 100 μm and nickel powder with grain size of 10 and 25 μm were used. Analysis of these porous structures and LHP design are described in the paper. And the measurements' influences of porous structures in LHP on heat removal from the insulated gate bipolar transistor (IGBT) have been made. PMID:24959622

  5. Electronic Transport and Quantum Hall Effect in Bipolar Graphene p-n-p Junctions

    NASA Astrophysics Data System (ADS)

    Özyilmaz, Barbaros; Jarillo-Herrero, Pablo; Efetov, Dmitri; Abanin, Dmitry A.; Levitov, Leonid S.; Kim, Philip

    2007-10-01

    We have developed a device fabrication process to pattern graphene into nanostructures of arbitrary shape and control their electronic properties using local electrostatic gates. Electronic transport measurements have been used to characterize locally gated bipolar graphene p-n-p junctions. We observe a series of fractional quantum Hall conductance plateaus at high magnetic fields as the local charge density is varied in the p and n regions. These fractional plateaus, originating from chiral edge states equilibration at the p-n interfaces, exhibit sensitivity to interedge backscattering which is found to be strong for some of the plateaus and much weaker for other plateaus. We use this effect to explore the role of backscattering and estimate disorder strength in our graphene devices.

  6. Refined Transistor Model For Simulation Of SEU

    NASA Technical Reports Server (NTRS)

    Zoutendyk, John A.; Benumof, Reuben

    1988-01-01

    Equivalent base resistance added. Theoretical study develops equations for parameters of Gummel-Poon model of bipolar junction transistor: includes saturation current, amplification factors, charging times, knee currents, capacitances, and resistances. Portion of study concerned with base region goes beyond Gummel-Poon analysis to provide more complete understanding of transistor behavior. Extended theory useful in simulation of single-event upset (SEU) caused in logic circuits by cosmic rays or other ionizing radiation.

  7. Ultra-High Voltage 4H-SiC Bi-Directional Insulated Gate Bipolar Transistors

    NASA Astrophysics Data System (ADS)

    Chowdhury, Sauvik

    4H- Silicon Carbide (4H-SiC) is an attractive material for power semiconductor devices due to its large bandgap, high critical electric field and high thermal conductivity compared to Silicon (Si). For ultra-high voltage applications (BV > 10 kV), 4H-SiC Insulated Gate Bipolar Transistors (IGBTs) are favored over unipolar transistors due to lower conduction losses. With improvements in SiC materials and processing technology, promising results have been demonstrated in the area of conventional unidirectional 4H-SiC IGBTs, with breakdown voltage ratings up to 27 kV. This research presents the experimental demonstration of the world's first high voltage bi-directional power transistors in 4H-SiC. Traditionally, four (two IGBTs and two diodes) or two (two reverse blocking IGBTs) semiconductor devices are necessary to yield a bidirectional switch. With a monolithically integrated bidirectional switch as presented here, the number of semiconductor devices is reduced to only one, which results in increased reliability and reduced cost of the overall system. Additionally, by using the unique dual gate operation of BD-IGBTs, switching losses can be reduced to a small fraction of that in conventional IGBTs, resulting in increased efficiency. First, the performance limits of SiC IGBTs are calculated by using analytical methods. The performance benefits of SiC IGBTs over SiC unipolar devices and Si IGBTs are quantified. Numerical simulations are used to optimize the unit cell and edge termination structures for a 15 kV SiC BD-IGBT. The effect of different device parameters on BD-IGBT static and switching performance are quantified. Second, the process technology necessary for the fabrication of high voltage SiC BD-IGBTs is optimized. The effect of different process steps on parameters such as breakdown voltage, carrier lifetime, gate oxide reliability, SiO2-SiC interface charge density is quantified. A carrier lifetime enhancement process has been optimized for lightly doped

  8. In Situ Bipolar Electroporation for Localized Cell Loading with Reporter Dyes and Investigating Gap Junctional Coupling

    PubMed Central

    De Vuyst, Elke; De Bock, Marijke; Decrock, Elke; Van Moorhem, Marijke; Naus, Christian; Mabilde, Cyriel; Leybaert, Luc

    2008-01-01

    Electroporation is generally used to transfect cells in suspension, but the technique can also be applied to load a defined zone of adherent cells with substances that normally do not permeate the plasma membrane. In this case a pulsed high-frequency oscillating electric field is applied over a small two-wire electrode positioned close to the cells. We compared unipolar with bipolar electroporation pulse protocols and found that the latter were ideally suited to efficiently load a narrow longitudinal strip of cells in monolayer cultures. We further explored this property to determine whether electroporation loading was useful to investigate the extent of dye spread between cells coupled by gap junctions, using wild-type and stably transfected C6 glioma cells expressing connexin 32 or 43. Our investigations show that the spatial spread of electroporation-loaded 6-carboxyfluorescein, as quantified by the standard deviation of Gaussian dye spread or the spatial constant of exponential dye spread, was a reliable approach to investigate the degree of cell-cell coupling. The spread of reporter dye between coupled cells was significantly larger with electroporation loading than with scrape loading, a widely used method for dye-coupling studies. We conclude that electroporation loading and dye transfer is a robust technique to investigate gap-junctional coupling that combines minimal cell damage with accurate probing of the degree of cell-cell communication. PMID:17872956

  9. Copper-Based OHMIC Contracts for the Si/SiGe Heterojunction Bipolar Transistor Structure

    NASA Technical Reports Server (NTRS)

    Das, Kalyan; Hall, Harvey

    1999-01-01

    Silicon based heterojunction bipolar transistors (HBT) with SiGe base are potentially important devices for high-speed and high-frequency microelectronics. These devices are particularly attractive as they can be fabricated using standard Si processing technology. However, in order to realize the full potential of devices fabricated in this material system, it is essential to be able to form low resistance ohmic contacts using low thermal budget process steps and have full compatibility with VLSI/ULSI processing. Therefore, a study was conducted in order to better understand the contact formation and to develop optimized low resistance contacts to layers with doping densities corresponding to the p-type SiGe base and n-type Si emitter regions of the HBTS. These as-grown doped layers were implanted with BF(sub 2) up to 1 X 10(exp 16)/CM(exp 2) and As up to 5 x 10(exp 15)/CM2, both at 30 keV for the p-type SiGe base and n-type Si emitter layers, respectively, in order to produce a low sheet resistance surface layer. Standard transfer length method (TLM) contact pads on both p and n type layers were deposited using an e-beam evaporated trilayer structure of Ti/CufTi/Al (25)A/1500A/250A/1000A). The TLM pads were delineated by a photoresist lift-off procedure. These contacts in the as-deposited state were ohmic, with specific contact resistances for the highest implant doses of the order of 10(exp -7) ohm-CM2 and lower.

  10. Triple implant (In,Ga)As/InP n-p-n heterojunction bipolar transistors for integrated circuit applications

    NASA Astrophysics Data System (ADS)

    Masum Choudhury, A. N. M.; Tabatabaie-Alavi, K.; Fonstad, C. G.

    1984-07-01

    For the first time (In,Ga)As/InP n-p-n heterojunction bipolar transistors (HJBT's) applicable to integrated circuits have been fabricated by triple ion implantation. The base has been formed by beryllium ion implantation and the collector by silicon ion implantation. The implants were made into an LPE-grown n-n (In,Ga)As/InP heterostructure on an n(+)-InP substrate. This inverted mode emitter-down heterojunction transistor structure demonstrates to a maximum current gain of 7 with no hysteresis in the characteristics. The ideality factors of the I(B) versus V(BE) and I(C) versus V(BE) characteristics with V(CB) = 0, are 1.25 and 1.08, respectively, indicating that the defect level in the heterojunction is low and that minority-carrier injection and diffusion is the dominant current flow mechanism.

  11. Single-Shot Charge Readout Using a Cryogenic Heterojunction Bipolar Transistor Preamplifier Inline with a Silicon Single Electron Transistor at Millikelvin Temperatures

    NASA Astrophysics Data System (ADS)

    Curry, Matthew; England, Troy; Wendt, Joel; Pluym, Tammy; Lilly, Michael; Carr, Stephen; Carroll, Malcolm

    Single-shot readout is a requirement for many implementations of quantum information processing. The single-shot readout fidelity is dependent on the signal-to-noise-ratio (SNR) and bandwidth of the readout detection technique. Several different approaches are being pursued to enhance read-out including RF-reflectometry, RF-transmission, parametric amplification, and transistor-based cryogenic preamplification. The transistor-based cryogenic preamplifier is attractive in part because of the reduced experimental complexity compared with the RF techniques. Here we present single-shot charge readout using a cryogenic Heterojunction-Bipolar-Transistor (HBT) inline with a silicon SET charge-sensor at millikelvin temperatures. For the relevant range of HBT DC-biasing, the current gain is 100 to 2000 and the power dissipation is 50 nW to 5 μW, with the microfabricated SET and discrete HBT in an integrated package mounted to the mixing chamber stage of a dilution refrigerator. We experimentally demonstrate a SNR of up to 10 with a bandwidth of 1 MHz, corresponding to a single-shot time-domain charge-sensitivity of approximately 10-4 e / √Hz. This measured charge-sensitivity is comparable to the values reported using the RF techniques. Sandia National Laboratories is a multi-program laboratory operated by Sandia Corporation, a Lockheed-Martin Company, for the U. S. Department of Energy under Contract No. DE-AC04-94AL85000.

  12. Impact ionization in the base of a hot-electron AlSb/InAs bipolar transistor

    NASA Technical Reports Server (NTRS)

    Vengurlekar, Arvind S.; Capasso, Federico; Chiu, T. Heng

    1990-01-01

    The operation of a new AlSb/InAs heterojunction bipolar transistor is studied. The electrons are injected into a p-InAs base across the AlSb/InAs heterojunction. The conduction-band discontinuity at this heterojunction is sufficiently large so that energy of the electrons injected into InAs exceeds the threshold for generating electron-hole pairs by impact ionization. The observed incremental common base current at zero collector-base bias decreases and becomes negative as the emitter current is increased, thus providing direct evidence for impact ionization entirely by band-edge discontinuities.

  13. New RAD-Hard STRH3260L6 Bipolar And STRH100N10 Mosfet Power Transistors

    NASA Astrophysics Data System (ADS)

    Camonita, Giuseppe; Pintacuda, Francesco

    2011-10-01

    This article describes two new power discrete components from STMicroelectronics, specifically offered for Space applications. The STRH3260L6 is a double bipolar rad-hard transistor in an SMD package that houses two complementary devices, one NPN and one PNP. The STRH100N10 is an N-channel rad-hard power MOSFET, the first that is ESCC qualified and available in Europe without procurement restrictions. The purpose of this writing is to give details about the devices' main features, characterization for static, dynamic and radiation performances.

  14. Theoretical results on the tandem junction solar cell based on its Ebers-Moll transistor model

    NASA Technical Reports Server (NTRS)

    Goradia, C.; Vaughn, J.; Baraona, C. R.

    1980-01-01

    A one-dimensional theoretical model of the tandem junction solar cell (TJC) with base resistivity greater than about 1 ohm-cm and under low level injection has been derived. This model extends a previously published conceptual model which treats the TJC as an npn transistor. The model gives theoretical expressions for each of the Ebers-Moll type currents of the illuminated TJC and allows for the calculation of the spectral response, I(sc), V(oc), FF and eta under variation of one or more of the geometrical and material parameters and 1MeV electron fluence. Results of computer calculations based on this model are presented and discussed. These results indicate that for space applications, both a high beginning of life efficiency, greater than 15% AM0, and a high radiation tolerance can be achieved only with thin (less than 50 microns) TJC's with high base resistivity (greater than 10 ohm-cm).

  15. Fully transparent organic transistors with junction-free metallic network electrodes

    SciTech Connect

    Pei, Ke; Wang, Zongrong; Ren, Xiaochen; Zhang, Zhichao; Peng, Boyu; Chan, Paddy K. L.

    2015-07-20

    We utilize highly transparent, junction-free metal network electrodes to fabricate fully transparent organic field effect transistors (OFETs). The patterned transparent Ag networks are developed by polymer crack template with adjustable line width and density. Sheet resistance of the network is 6.8 Ω/sq and optical transparency in the whole visible range is higher than 80%. The bottom contact OFETs with DNTT active layer and parylene-C dielectric insulator show a maximum field-effect mobility of 0.13 cm{sup 2}/V s (average mobility is 0.12 cm{sup 2}/V s) and on/off ratio is higher than 10{sup 7}. The current OFETs show great potential for applications in the next generation of transparent and flexible electronics.

  16. A study of the effects of the base doping profile on SiGe heterojunction bipolar transistor performance for all levels of injection

    NASA Astrophysics Data System (ADS)

    Khanduri, Gagan; Panwar, Brishbhan

    2006-04-01

    The effects of two different base doping profiles on the current gain and cut-off frequency for all levels of current injection have been studied for NPN Si/SiGe/Si double heterojunction bipolar transistors (SiGe DHBTs). The two-dimensional simulation results for a SiGe DHBT with uniform base doping and a fixed base Gummel number are compared with a non-uniform base doping profile SiGe drift-DHBT device. The study explains the performance of SiGe HBTs at different injection levels by analysing the electron and hole mobility, drift velocity, electric field, junction capacitances and intrinsic and extrinsic base region conductivities. The base doping profile in the SiGe drift-DHBT is controlled in such a way that it creates a net accelerating drift field in the quasi-neutral base for minority electrons. This accelerating field subsequently improves the current gain and cut-off frequency for the SiGe drift-DHBT in comparison with the SiGe DHBT for all levels of injection.

  17. Radiation effects on silicon bipolar transistors caused by 3-10 MeV protons and 20-60 MeV bromine ions

    NASA Astrophysics Data System (ADS)

    Li, Xingji; Geng, Hongbin; Lan, Mujie; Liu, Chaoming; Yang, Dezhuang; He, Shiyu

    2010-03-01

    The current gain degradation in silicon NPN bipolar junction transistors (BJTs) was examined under irradiation with 3-10 MeV protons and 20-60 MeV bromine (Br) ions with various dose levels. To characterize the radiation damage of the NPN BJTs, the ionizing dose D i and displacement dose D d as a function of chip depth in the NPN BJTs were calculated for both the protons and Br ions with different energies. Based on the irradiation testing and calculated results, it is shown that the current gain degradation of NPN BJTs is sensitive to the ratio of D d/( D d+ D i) in the sensitive region given by protons and Br ions. The irradiation particles (protons and Br ions), which give larger D d/( D d+ D i) at a given total dose, would generate more severe damage to the NPN BJTs. The reciprocal of the gain variation as a function of the displacement dose was compared, showing that the Messenger-Spratt equation becomes relevant to describe the experimental data, when the ratio of the D d/( D d+ D i) are larger and the displacement dose are higher than a certain value.

  18. Analysis of the dynamic avalanche of carrier stored trench bipolar transistor (CSTBT) during clamped inductive turn-off transient

    NASA Astrophysics Data System (ADS)

    Xue, Peng; Fu, Guicui

    2017-03-01

    The dynamic avalanche has a huge impact on the switching robustness of carrier stored trench bipolar transistor (CSTBT). The purpose of this work is to investigate the CSTBT's dynamic avalanche mechanism during clamped inductive turn-off transient. At first, with a Mitsubishi 600 V/150 A CSTBT and a Infineon 600 V/200 A field stop insulated gate bipolar transistor (FS-IGBT) utilized, the clamped inductive turn-off characteristics are obtained by double pulse test. The unclamped inductive switching (UIS) test is also utilized to identify the CSTBT's clamping voltage under dynamic avalanche condition. After the test data analysis, it is found that the CSTBT's dynamic avalanche is abnormal and can be triggered under much looser condition than the conventional buffer layer IGBT. The comparison between the FS-IGBT and CSTBT's experimental results implies that the CSTBT's abnormal dynamic avalanche phenomenon may be induced by the carrier storage (CS) layer. Based on the semiconductor physics, the electric field distribution and dynamic avalanche generation in the depletion region are analyzed. The analysis confirms that the CS layer is the root cause of the CSTBT's abnormal dynamic avalanche mechanism. Moreover, the CSTBT's negative gate capacitance effect is also investigated to clarify the underlying mechanism of the gate voltage bump observed in the test. In the end, the mixed-mode numerical simulation is utilized to reproduce the CSTBT's dynamic avalanche behavior. The simulation results validate the proposed dynamic avalanche mechanisms.

  19. A low-noise K-Ka band oscillator using AlGaAs/GaAs heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Madihian, Mohammad; Takahashi, Hideki

    1991-01-01

    The design considerations, fabrication process, and performance of the first K-Ka-band oscillator implemented using a self-aligned AlGaAs/GaAs heterojunction bipolar transistor (HBT) are described. A large-signal time-domain-based design approach has been used which applies a SPICE-F simulator for optimization of the oscillator circuit parameters for maximum output power. The oscillator employs a 2 x 10 sq mm emitter AlGaAs/GaAs HBT that was fabricated using a pattern inversion technology. The HBT has a base current 1/f noise power density lower than 1 x 10 to the -20th sq A/Hz at 1 kHz and lower than 1 x 10 to the -22nd sq A/Hz at 100 kHz for a collector current of 1 mA. The oscillator, which is composed of only low-Q microstrip transmission lines, has a phase noise of -80 dBc/Hz at 100 kHz off carrier when operated at 26.6 GHz. These results indicate the applicability of the HBTs to low-phase-noise monolithic oscillators at microwave and millimeter-wave frequencies, where both Si bipolar transistors and GaAs FETs are absent.

  20. Two-zone SiGe base heterojunction bipolar charge plasma transistor for next generation analog and RF applications

    NASA Astrophysics Data System (ADS)

    Bramhane, Lokesh Kumar; Singh, Jawar

    2017-01-01

    For next generation terahertz applications, heterojunction bipolar transistor (HBT) with reduced dimensions and charge plasma (CP) can be a potential candidate due to simplified and inexpensive process. In this paper, a symmetric lateral two-zone SiGe base heterojunction bipolar charge plasma transistor (HBCPT) with an extruded (extended) base is proposed and its performance at circuit level is studied. The linearly graded electric field in the proposed HBCPT provides improved self gain (β) and cut-off frequency (fT). Two-dimensional (2-D) TCAD and small-signal model based simulations of the proposed HBCPT demonstrates high self gain β 35-172.93 and fT of 1-4 THz for different device parameters. Moreover, fT of 1104.9 GHz and β of 35 can be achieved by decreasing Nb up to 8.2 ×1017cm-3 . Although, fT of 2 THz and 4 THz can also be achieved by reducing the base resistance up to 10 Ω and increasing the emitter/collector length up to 63 nm, respectively. The small-signal analysis of common-emitter amplifier based on the proposed HBCPT demonstrate high voltage gain of 50.11 as compared to conventional HBT (18.1).

  1. Programmable Schottky Junctions Based on Ferroelectric Gated MoS2 Transistors

    NASA Astrophysics Data System (ADS)

    Xiao, Zhiyong; Song, Jingfeng; Drcharme, Stephen; Hong, Xia

    We report a programmable Schottky junction based on MoS2 field effect transistors with a SiO2 back gate and a ferroelectric copolymer poly(vinylidene-fluoride-trifluorethylene) (PVDF) top gate. We fabricated mechanically exfoliated single layer MoS2 flakes into two point devices via e-beam lithography, and deposited on the top of the devices ~20 nm PVDF thin films. The polarization of the PVDF layer is controlled locally by conducting atomic force microscopy. The devices exhibit linear ID-VD characteristics when the ferroelectric gate is uniformly polarized in one direction. We then polarized the gate into two domains with opposite polarization directions, and observed that the ID-VD characteristics of the MoS2 channel can be modulated between linear and rectified behaviors depending on the back gate voltage. The nonlinear ID-VD relation emerges when half of the channel is in the semiconductor phase while the other half is in the metallic phase, and it can be well described by the thermionic emission model with a Schottky barrier of ~0.5 eV. The Schottky junction can be erased by re-write the entire channel in the uniform polarization state. Our study facilitates the development of programmable, multifunctional nanoelectronics based on layered 2D TMDs..

  2. Design, fabrication, and analysis of p-channel arsenide/antimonide hetero-junction tunnel transistors

    SciTech Connect

    Rajamohanan, Bijesh Mohata, Dheeraj; Hollander, Matthew; Datta, Suman; Zhu, Yan; Hudait, Mantu; Jiang, Zhengping; Klimeck, Gerhard

    2014-01-28

    In this paper, we demonstrate InAs/GaSb hetero-junction (hetJ) and GaSb homo-junction (homJ) p-channel tunneling field effect transistors (pTFET) employing a low temperature atomic layer deposited high-κ gate dielectric. HetJ pTFET exhibited drive current of 35 μA/μm in comparison to homJ pTFET, which exhibited drive current of 0.3 μA/μm at V{sub DS} = −0.5 V under DC biasing conditions. Additionally, with pulsing of 1 μs gate voltage, hetJ pTFET exhibited enhanced drive current of 85 μA/μm at V{sub DS} = −0.5 V, which is the highest reported in the category of III-V pTFET. Detailed device characterization was performed through analysis of the capacitance-voltage characteristics, pulsed current-voltage characteristics, and x-ray diffraction studies.

  3. Comparison of total dose effects on SiGe heterojunction bipolar transistors induced by different swift heavy ion irradiation

    NASA Astrophysics Data System (ADS)

    Sun, Ya-Bin; Fu, Jun; Xu, Jun; Wang, Yu-Dong; Zhou, Wei; Zhang, Wei; Cui, Jie; Li, Gao-Qing; Liu, Zhi-Hong

    2014-11-01

    The degradations in NPN silicon-germanium (SiGe) heterojunction bipolar transistors (HBTs) were fully studied in this work, by means of 25-MeV Si, 10-MeV Cl, 20-MeV Br, and 10-MeV Br ion irradiation, respectively. Electrical parameters such as the base current (IB), current gain (β), neutral base recombination (NBR), and Early voltage (VA) were investigated and used to evaluate the tolerance to heavy ion irradiation. Experimental results demonstrate that device degradations are indeed radiation-source-dependent, and the larger the ion nuclear energy loss is, the more the displacement damages are, and thereby the more serious the performance degradation is. The maximum degradation was observed in the transistors irradiated by 10-MeV Br. For 20-MeV and 10-MeV Br ion irradiation, an unexpected degradation in IC was observed and Early voltage decreased with increasing ion fluence, and NBR appeared to slow down at high ion fluence. The degradations in SiGe HBTs were mainly attributed to the displacement damages created by heavy ion irradiation in the transistors. The underlying physical mechanisms are analyzed and investigated in detail.

  4. Bipolar spin-valley diode effect in a silicene magnetic junction

    NASA Astrophysics Data System (ADS)

    Zhai, Xuechao; Zhang, Sihao; Zhao, Ying; Zhang, Xiaoyu; Yang, Zhihong

    2016-09-01

    Silicene has attracted much attention recently due to the electrons' multiple degrees of freedom, specifically for spin and valley. We here demonstrate that a bipolar spin-valley diode effect can be driven and controlled by applying longitudinal biases through a silicene ferromagnetic-field/interlayer-electric-field junction. This effect indicates that only one-spin (the other spin) electrons from one valley (the other valley) contribute to the conductance under positive (negative) biases, originating from the specific band-matching tunneling mechanism. All the forbidden channels are induced by either spin-mismatch or spin-valley dependent bandgaps. It is also found that, by reversing the direction of interlayer electric field, the conductive valley can be switched to the other while the spin orientation is reserved. Furthermore, all the possible spin-valley configurations of conductance, contributed by single spin and single valley, can be completely turned "on" or "off" only by tuning the bias and the electric field. These results suggest that silicene can be a good candidate for future quantum information processing in spin-valley logic circuits.

  5. Compact Modeling of Floating-Base Effect in Injection-Enhanced Insulated-Gate Bipolar Transistor Based on Potential Modification by Accumulated Charge

    NASA Astrophysics Data System (ADS)

    Yamamoto, Takao; Miyake, Masataka; Miura-Mattausch, Mitiko

    2013-04-01

    We have developed a compact model of the injection-enhanced insulated-gate bipolar transistor (IGBT) applicable for circuit optimization. The main development is modeling the hole accumulation in the floating-base region. It is demonstrated that the observed negative gate capacitance is well reproduced with the developed model.

  6. Forward-bias tunneling - A limitation to bipolar device scaling

    NASA Technical Reports Server (NTRS)

    Del Alamo, Jesus A.; Swanson, Richard M.

    1986-01-01

    Forward-bias tunneling is observed in heavily doped p-n junctions of bipolar transistors. A simple phenomenological model suitable to incorporation in device codes is developed. The model identifies as key parameters the space-charge-region (SCR) thickness at zero bias and the reduced doping level at its edges which can both be obtained from CV characteristics. This tunneling mechanism may limit the maximum gain achievable from scaled bipolar devices.

  7. Antenna-Coupled Superconducting Tunnel Junctions with Single-Electron Transistor Readout for Detection of Sub-mm Radiation

    NASA Technical Reports Server (NTRS)

    Stevenson, T. R.; Hsieh, W.-T.; Li, M. J.; Stahle, C. M.; Wollack, E. J.; Schoelkopf, R. J.; Teufel, J.; Krebs, Carolyn (Technical Monitor)

    2002-01-01

    Antenna-coupled superconducting tunnel junction detectors have the potential for photon-counting sensitivity at sub-mm wavelengths. The device consists of an antenna structure to couple radiation into a small superconducting volume and cause quasiparticle excitations, and a single-electron transistor to measure currents through tunnel junction contacts to the absorber volume. We will describe optimization of device parameters, and recent results on fabrication techniques for producing devices with high yield for detector arrays. We will also present modeling of expected saturation power levels, antenna coupling, and rf multiplexing schemes.

  8. All-optical transistors and logic gates using a parity-time-symmetric Y-junction: Design and simulation

    SciTech Connect

    Ding, Shulin; Wang, Guo Ping

    2015-09-28

    Classical nonlinear or quantum all-optical transistors are dependent on the value of input signal intensity or need extra co-propagating beams. In this paper, we present a kind of all-optical transistors constructed with parity-time (PT)-symmetric Y-junctions, which perform independently on the value of signal intensity in an unsaturated gain case and can also work after introducing saturated gain. Further, we show that control signal can switch the device from amplification of peaks in time to transformation of peaks to amplified troughs. By using these PT-symmetric Y-junctions with currently available materials and technologies, we can implement interesting logic functions such as NOT and XOR (exclusive OR) gates, implying potential applications of such structures in designing optical logic gates, optical switches, and signal transformations or amplifications.

  9. Improved methods of forming monolithic integrated circuits having complementary bipolar transistors

    NASA Technical Reports Server (NTRS)

    Bohannon, R. O., Jr.; Cashion, W. F.; Stehlin, R. A.

    1971-01-01

    Two new processes form complementary transistors in monolithic semiconductor circuits, require fewer steps /infusions/ than previous methods, and eliminate such problems as nonuniform h sub FE distribution, low yield, and large device formation.

  10. First- and second-order electrical modelling and experiment on very high speed SiGeC heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Nunez-Perez, José Cruz; Lakhdara, Maya; Bouhouche, Manel; Verdier, Jacques; Latreche, Saïda; Gontrand, Christian

    2009-04-01

    We present in this paper an electrical study centred on NPN heterojunction bipolar transistors (HBTs), realized in an industrial BiCMOS SiGe:C process, featuring high attractive performances (ft > 200 GHz) in terms of microwave behaviour and low-frequency noise; reaching this level of performance with good dc characteristics could be however a difficult challenge. Electrical modelling is investigated, using our 2D simulator, based on the drift-diffusion model (DDM). The simulations were very efficient for optimizing the devices. The dc and ac results obtained in this work are efficiently compared with electrical characteristics coming from measurements and SPICE-like parameter extractions, from simulations via a compact model (HICUM) implemented in the so-called commercial simulator ADS (advanced design system). This work was a first step for designing RF circuits like oscillators in a simple way.

  11. Technology and First Electrical Characteristics of Complementary NPN and PNP InAlAs/InGaAs Heterojunction Bipolar Transistors

    NASA Astrophysics Data System (ADS)

    Cui, Delong; Pavlidis, Dimitris; Sawdai, Donald; Chin, Patrick; Block, Tom

    2002-02-01

    A selective molecular beam epitaxy (MBE) regrowth approach is presented and applied in the demonstration of complementary InP heterojunction bipolar transistor (HBT) technology for monolithic integration of NPN and PNP HBTs. State-of-art performance has been observed: The DC gain was 35 for both integrated NPN and PNP HBTs. fT of 79.6 GHz and fmax of 109 GHz were achieved for NPN devices while fT of 11.6 GHz and fmax of 22.6 GHz were achieved for PNP devices. Little performance degradation has been observed compared with same design NPN or PNP HBT layers grown on individual substrates. Monolithic microwave integrated circuits (MMICs) based on complementary InP HBT technology have been studied for the first time using this technology and their electrical characteristics are presented.

  12. New isolated gate bipolar transistor two-quadrant chopper power supply for a fast field cycling nuclear magnetic resonance spectrometer

    NASA Astrophysics Data System (ADS)

    Sousa, D. M.; Marques, G. D.; Sebastião, P. J.; Ribeiro, A. C.

    2003-10-01

    This work, presents, for the first time, an Isolated Gate Bipolar Transistor (IGBT) two-quadrant chopper power supply for a fast field cycling (FFC) nuclear magnetic resonance spectrometer. This power supply was designed to achieve a maximum current of 200 A with good efficiency, low semiconductor losses, low cost, and easy maintenance. Both energy storage circuits and dumping circuits are used to obtain switching times less than 2 ms between field levels in agreement with the FFC technique specifications. The current ripple at high currents is better than 1×10-4 and presents a specific shape which can be used for additional compensation using auxiliary circuits. The implemented power supply was tested and been continuously operating with a home-built FFC solenoidal magnet, associated cooling system, and rf units for fields between 0 and 0.2 T.

  13. SEMICONDUCTOR DEVICES: EMP injection damage effects of a bipolar transistor and its relationship between the injecting voltage and energy

    NASA Astrophysics Data System (ADS)

    Xiaowen, Xi; Changchun, Chai; Xingrong, Ren; Yintang, Yang; Bing, Zhang; Xiao, Hong

    2010-04-01

    The response of a bipolar transistor (BJT) under a square-wave electromagnetic pulse (EMP) with different injecting voltages is investigated. Adopting the curve fitting method, the relationship between the burnout time, the damage energy and the injecting voltage is obtained. Research shows that the damage energy is not a constant value, but changes with the injecting voltage level. By use of the device simulator Medici, the internal behavior of the burned device is analyzed. Simulation results indicate that the variation of the damage energy with injecting voltage is caused by the distribution change of hot spot position under different injection levels. Therefore, the traditional way to evaluate the trade-off between the burnout time and the injecting voltage is not comprehensive due to the variation of the damage energy.

  14. Influence of the external component on the damage of the bipolar transistor induced by the electromagnetic pulse

    NASA Astrophysics Data System (ADS)

    Xiaowen, Xi; Changchun, Chai; Xingrong, Ren; Yintang, Yang; Zhenyang, Ma; Jing, Wang

    2010-07-01

    A study on the influence of the external resistor and the external voltage source during the injection of the electromagnetic pulse (EMP) into the bipolar transistor (BJT) is carried out. Research shows that the increase of the external resistor Rb at base makes the burnout time of the device decrease slightly, the increase of the external voltage source Vbe at base can aid the damage of the device when the magnitude of the injecting voltage is relatively low and has little influence when the magnitude is sufficiently high causing the device appearing the PIN structure damage, and the increase of the external resistor Re can remarkably reduce the voltage drops added to the device and improve the durability of the device. In the final analysis, the effect of the external circuit component on the BJT damage is the influence on the condition which makes the device appear current-mode second breakdown.

  15. Computer-aided prediction of high-frequency performance limits in silicon bipolar integrated circuits

    NASA Technical Reports Server (NTRS)

    Burns, J. L.; Choma, J., Jr.

    1982-01-01

    A circuit model for an existing silicon integrated bipolar junction transistor (IBJT) is used to evaluate presently achievable high frequency circuit performance. The relationship between circuit model and processing parameters are semi-quantitatively explored to make predictions on the frequency response, which can be achieved through realistic device fabrication modifications. A new figure of merit is introduced, which is defined as the signal frequency at which an integrated bipolar junction transistor can deliver a power gain of G. The most sensitive parameter influencing attainable high frequency IBJT performance is base resistance.

  16. Fabrication and characterization of GaN junction field effect transistors

    SciTech Connect

    Zhang, L.; Lester, L.F.; Baca, A.G.; Shul, R.J.; Chang, P.C.; Willison, C.L.; Mishra, U.K.; Denbaars, S.P.; Zolper, J.C.

    2000-01-11

    Junction field effect transistors (JFET) were fabricated on a GaN epitaxial structure grown by metal organic chemical vapor deposition. The DC and microwave characteristics, as well as the high temperature performance of the devices were studied. These devices exhibited excellent pinch-off and a breakdown voltage that agreed with theoretical predictions. An extrinsic transconductance (g{sub m}) of 48 mS/mm was obtained with a maximum drain current (I{sub D}) of 270 mA/mm. The microwave measurement showed an f{sub T} of 6 GHz and an f{sub max} of 12 GHz. Both the I{sub D} and the g{sub m} were found to decrease with increasing temperature, possibly due to lower electron mobility at elevated temperatures. These JFETs exhibited a significant current reduction after a high drain bias was applied, which was attributed to a partially depleted channel caused by trapped electrons in the semi-insulating GaN buffer layer.

  17. Photodetection in p-n junctions formed by electrolyte-gated transistors of two-dimensional crystals

    NASA Astrophysics Data System (ADS)

    Kozawa, Daichi; Pu, Jiang; Shimizu, Ryo; Kimura, Shota; Chiu, Ming-Hui; Matsuki, Keiichiro; Wada, Yoshifumi; Sakanoue, Tomo; Iwasa, Yoshihiro; Li, Lain-Jong; Takenobu, Taishi

    2016-11-01

    Transition metal dichalcogenide monolayers have attracted much attention due to their strong light absorption and excellent electronic properties. These advantages make this type of two-dimensional crystal a promising one for optoelectronic device applications. In the case of photoelectric conversion devices such as photodetectors and photovoltaic cells, p-n junctions are one of the most important devices. Here, we demonstrate photodetection with WSe2 monolayer films. We prepare the electrolyte-gated ambipolar transistors and electrostatic p-n junctions are formed by the electrolyte-gating technique at 270 K. These p-n junctions are cooled down to fix the ion motion (and p-n junctions) and we observed the reasonable photocurrent spectra without the external bias, indicating the formation of p-n junctions. Very interestingly, two-terminal devices exhibit higher photoresponsivity than that of three-terminal ones, suggesting the formation of highly balanced anion and cation layers. The maximum photoresponsivity reaches 5 mA/W in resonance with the first excitonic peak. Our technique provides important evidence for optoelectronics in atomically thin crystals.

  18. The 4H-SiC npn power bipolar junction transistor

    NASA Astrophysics Data System (ADS)

    Wang, J.; Williams, B. W.

    1999-12-01

    The static and dynamic performance of the power silicon carbide BJT is investigated and compared with the silicon carbide UMOSFET by employing a numerical semiconductor simulator. The silicon carbide BJT exhibits superior current handling ability to and switching speed comparable with the SiC MOSFET in the voltage range simulated (1 kV-4 kV). The high current gain of the SiC BJT redresses the base drive problem of the silicon power BJT. It is proposed that research be carried out on the power silicon carbide NPN BJT, since it does not have the premature gate oxide breakdown and low inversion layer mobility problems associated with SiC MOSFET technology.

  19. High current gain 4H-SiC bipolar junction transistor

    NASA Astrophysics Data System (ADS)

    Yourun, Zhang; Jinfei, Shi; Ying, Liu; Chengchun, Sun; Fei, Guo; Bo, Zhang

    2016-04-01

    A novel 4H-SiC BJT of high current gain with a suppressing surface traps effect has been proposed. It is effective to improve the current gain due to the lower electrons density in the surface region by extending the emitter metal to overlap the passivation layer on the extrinsic base surface. The electrons trapped in the extrinsic base surface induce the degeneration of SiC BJTs device performance. By modulating the electron recombination rate, the novel structure can increase the current gain to 63.2% compared with conventional ones with the compatible process technology. Optimized sizes are an overlapped metal length of 4 μm, as well as an oxide layer thickness of 50 nm. Project supported by the National Natural Science Foundation of China (Nos. 61306093, 61401075).

  20. Comments on determination of bandgap narrowing from activation plots. [for bipolar transistors

    NASA Technical Reports Server (NTRS)

    Park, J.-S.; Neugroschel, A.; Lindholm, F. A.

    1986-01-01

    A determination is made of the temperature-dependence of emitter saturation current in bipolar devices which allows the derivation of a value for bandgap narrowing that is in better agreement with other determinations than previous results based on ohmic contact measurements of temperature dependence. The new values were obtained by varying the surface recombination velocity at the emitter surface. This improves accuracy by varying the minority carrier surface recombination velocity at the emitter contacts of otherwise indistinguishable emitters.

  1. Nondestructive characterization of RBSOA of high-power bipolar transistors. [Reverse-bias safe operating area

    NASA Technical Reports Server (NTRS)

    Jovanovic, M. M.; Lee, F. C.; Chen, D. Y.

    1986-01-01

    Reverse-bias safe operating area (RBSOA) of high-power Darlington transistors is characterized using a 120 A/1000 V nondestructive reverse-bias second breakdown tester designed and fabricated at Virginia Polytechnic Institute and State University. Elaborate RBSOA characteristics are generated with different forward/reverse base drives and collector current levels. The effects of elevated case temperature and second-base drive on RBSOA of four-terminal Darlington devices are also discussed.

  2. Graded junction termination extensions for electronic devices

    NASA Technical Reports Server (NTRS)

    Merrett, J. Neil (Inventor); Isaacs-Smith, Tamara (Inventor); Sheridan, David C. (Inventor); Williams, John R. (Inventor)

    2006-01-01

    A graded junction termination extension in a silicon carbide (SiC) semiconductor device and method of its fabrication using ion implementation techniques is provided for high power devices. The properties of silicon carbide (SiC) make this wide band gap semiconductor a promising material for high power devices. This potential is demonstrated in various devices such as p-n diodes, Schottky diodes, bipolar junction transistors, thyristors, etc. These devices require adequate and affordable termination techniques to reduce leakage current and increase breakdown voltage in order to maximize power handling capabilities. The graded junction termination extension disclosed is effective, self-aligned, and simplifies the implementation process.

  3. Graded junction termination extensions for electronic devices

    NASA Technical Reports Server (NTRS)

    Merrett, J. Neil (Inventor); Isaacs-Smith, Tamara (Inventor); Sheridan, David C. (Inventor); Williams, John R. (Inventor)

    2007-01-01

    A graded junction termination extension in a silicon carbide (SiC) semiconductor device and method of its fabrication using ion implementation techniques is provided for high power devices. The properties of silicon carbide (SiC) make this wide band gap semiconductor a promising material for high power devices. This potential is demonstrated in various devices such as p-n diodes, Schottky diodes, bipolar junction transistors, thyristors, etc. These devices require adequate and affordable termination techniques to reduce leakage current and increase breakdown voltage in order to maximize power handling capabilities. The graded junction termination extension disclosed is effective, self-aligned, and simplifies the implementation process.

  4. A high voltage silicon-on-insulator lateral insulated gate bipolar transistor with a reduced cell-pitch

    NASA Astrophysics Data System (ADS)

    Luo, Xiao-Rong; Wang, Qi; Yao, Guo-Liang; Wang, Yuan-Gang; Lei, Tian-Fei; Wang, Pei; Jiang, Yong-Heng; Zhou, Kun; Zhang, Bo

    2013-02-01

    A high voltage (> 600 V) integrable silicon-on-insulator (SOI) trench-type lateral insulated gate bipolar transistor (LIGBT) with a reduced cell-pitch is proposed. The LIGBT features multiple trenches (MTs): two oxide trenches in the drift region and a trench gate extended to the buried oxide (BOX). Firstly, the oxide trenches enhance electric field strength because of the lower permittivity of oxide than that of Si. Secondly, oxide trenches bring in multi-directional depletion, leading to a reshaped electric field distribution and an enhanced reduced-surface electric-field (RESURF) effect. Both increase the breakdown voltage (BV). Thirdly, oxide trenches fold the drift region around the oxide trenches, leading to a reduced cell-pitch. Finally, the oxide trenches enhance the conductivity modulation, resulting in a high electron/hole concentration in the drift region as well as a low forward voltage drop (Von). The oxide trenches cause a low anode—cathode capacitance, which increases the switching speed and reduces the turn-off energy loss (Eoff). The MT SOI LIGBT exhibits a BV of 603 V at a small cell-pitch of 24 μm, a Von of 1.03 V at 100 A/cm-2, a turn-off time of 250 ns and Eoff of 4.1×10-3 mJ. The trench gate extended to BOX synchronously acts as dielectric isolation between high voltage LIGBT and low voltage circuits, simplifying the fabrication processes.

  5. A 65-kV insulated gate bipolar transistor switch applied in damped AC voltages partial discharge detection system.

    PubMed

    Jiang, J; Ma, G M; Luo, D P; Li, C R; Li, Q M; Wang, W

    2014-02-01

    Damped AC voltages detection system (DAC) is a productive way to detect the faults in power cables. To solve the problems of large volume, complicated structure and electromagnetic interference in existing switches, this paper developed a compact solid state switch based on electromagnetic trigger, which is suitable for DAC test system. Synchronous electromagnetic trigger of 32 Insulated Gate Bipolar Transistors (IGBTs) in series was realized by the topological structure of single line based on pulse width modulation control technology. In this way, external extension was easily achieved. Electromagnetic trigger and resistor-capacitor-diode snubber circuit were optimized to reduce the switch turn-on time and circular layout. Epoxy encapsulating was chosen to enhance the level of partial discharge initial voltage (PDIV). The combination of synchronous trigger and power supply is proposed to reduce the switch volume. Moreover, we have overcome the drawback of the electromagnetic interference and improved the detection sensitivity of DAC by using capacitor storage energy to maintain IGBT gate driving voltage. The experimental results demonstrated that the solid-state switch, with compact size, whose turn-on time was less than 400 ns and PDIV was more than 65 kV, was able to meet the actual demands of 35 kV DAC test system.

  6. AlGaAs/InGaAsN/GaAs PnP double heterojunction bipolar transistor

    SciTech Connect

    Chang, P.C.; Baca, A.G.; Li, N.Y.; Sharps, P.R.; Hou, H.Q.; Laroche, J.R.; Ren, F.

    2000-01-04

    The authors demonstrated a functional PnP double heterojunction bipolar transistor (DHBT) using AlGaAs, InGaAsN, and GaAs. The band alignment between InGaAsN and GaAs has a large {triangle}E{sub c} and negligible {triangle}E{sub v}, this unique characteristic is very suitable for PnP DHBT applications. The metalorganic vapor phase epitaxy (MOCVD) grown Al{sub 0.3}Ga{sub 0.7}As/In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01}/GaAs PnP DHBT is lattice matched to GaAs and has a peak current gain of 25. Because of the smaller bandgap (E{sub g}=1.20eV) of In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01} used for the base layer, this device has a low V{sub ON} of 0.79 V, which is 0.25 V lower than in a comparable Pnp AlGaAs/GaAs HBT. And because GaAs is used for the collector, its BV{sub CEO} is 12 V, consistent with BV{sub CEO} of AlGaAs/GaAs HBTs.

  7. A 65-kV insulated gate bipolar transistor switch applied in damped AC voltages partial discharge detection system

    NASA Astrophysics Data System (ADS)

    Jiang, J.; Ma, G. M.; Luo, D. P.; Li, C. R.; Li, Q. M.; Wang, W.

    2014-02-01

    Damped AC voltages detection system (DAC) is a productive way to detect the faults in power cables. To solve the problems of large volume, complicated structure and electromagnetic interference in existing switches, this paper developed a compact solid state switch based on electromagnetic trigger, which is suitable for DAC test system. Synchronous electromagnetic trigger of 32 Insulated Gate Bipolar Transistors (IGBTs) in series was realized by the topological structure of single line based on pulse width modulation control technology. In this way, external extension was easily achieved. Electromagnetic trigger and resistor-capacitor-diode snubber circuit were optimized to reduce the switch turn-on time and circular layout. Epoxy encapsulating was chosen to enhance the level of partial discharge initial voltage (PDIV). The combination of synchronous trigger and power supply is proposed to reduce the switch volume. Moreover, we have overcome the drawback of the electromagnetic interference and improved the detection sensitivity of DAC by using capacitor storage energy to maintain IGBT gate driving voltage. The experimental results demonstrated that the solid-state switch, with compact size, whose turn-on time was less than 400 ns and PDIV was more than 65 kV, was able to meet the actual demands of 35 kV DAC test system.

  8. Magnetic Vortex Based Transistor Operations

    PubMed Central

    Kumar, D.; Barman, S.; Barman, A.

    2014-01-01

    Transistors constitute the backbone of modern day electronics. Since their advent, researchers have been seeking ways to make smaller and more efficient transistors. Here, we demonstrate a sustained amplification of magnetic vortex core gyration in coupled two and three vortices by controlling their relative core polarities. This amplification is mediated by a cascade of antivortex solitons travelling through the dynamic stray field. We further demonstrated that the amplification can be controlled by switching the polarity of the middle vortex in a three vortex sequence and the gain can be controlled by the input signal amplitude. An attempt to show fan–out operation yielded gain for one of the symmetrically placed branches which can be reversed by switching the core polarity of all the vortices in the network. The above observations promote the magnetic vortices as suitable candidates to work as stable bipolar junction transistors (BJT). PMID:24531235

  9. Magnetic vortex based transistor operations.

    PubMed

    Kumar, D; Barman, S; Barman, A

    2014-02-17

    Transistors constitute the backbone of modern day electronics. Since their advent, researchers have been seeking ways to make smaller and more efficient transistors. Here, we demonstrate a sustained amplification of magnetic vortex core gyration in coupled two and three vortices by controlling their relative core polarities. This amplification is mediated by a cascade of antivortex solitons travelling through the dynamic stray field. We further demonstrated that the amplification can be controlled by switching the polarity of the middle vortex in a three vortex sequence and the gain can be controlled by the input signal amplitude. An attempt to show fan-out operation yielded gain for one of the symmetrically placed branches which can be reversed by switching the core polarity of all the vortices in the network. The above observations promote the magnetic vortices as suitable candidates to work as stable bipolar junction transistors (BJT).

  10. A dc model for power switching transistors suitable for computer-aided design and analysis

    NASA Technical Reports Server (NTRS)

    Wilson, P. M.; George, R. T., Jr.; Owen, H. A.; Wilson, T. G.

    1979-01-01

    A model for bipolar junction power switching transistors whose parameters can be readily obtained by the circuit design engineer, and which can be conveniently incorporated into standard computer-based circuit analysis programs is presented. This formulation results from measurements which may be made with standard laboratory equipment. Measurement procedures, as well as a comparison between actual and computed results, are presented.

  11. Logic gates based on ion transistors.

    PubMed

    Tybrandt, Klas; Forchheimer, Robert; Berggren, Magnus

    2012-05-29

    Precise control over processing, transport and delivery of ionic and molecular signals is of great importance in numerous fields of life sciences. Integrated circuits based on ion transistors would be one approach to route and dispense complex chemical signal patterns to achieve such control. To date several types of ion transistors have been reported; however, only individual devices have so far been presented and most of them are not functional at physiological salt concentrations. Here we report integrated chemical logic gates based on ion bipolar junction transistors. Inverters and NAND gates of both npn type and complementary type are demonstrated. We find that complementary ion gates have higher gain and lower power consumption, as compared with the single transistor-type gates, which imitates the advantages of complementary logics found in conventional electronics. Ion inverters and NAND gates lay the groundwork for further development of solid-state chemical delivery circuits.

  12. Tunneling field effect transistor integrated with black phosphorus-MoS2 junction and ion gel dielectric

    NASA Astrophysics Data System (ADS)

    Xu, Jiao; Jia, Jingyuan; Lai, Shen; Ju, Jaehyuk; Lee, Sungjoo

    2017-01-01

    We report an interband tunneling field effect transistor (TFET) integrated with a Black Phosphorus (BP)-MoS2 junction and ion gel as a top gate dielectric. The operation of the BP-MOS2 TFET is based on the modulation of the energy band alignment of the BP-MoS2 junction with electrostatic gating control on the MoS2 channel from the top gate through the ion gel dielectric and the supply of tunneling carriers from the BP source, which is degenerately doped with ion gel. The obtained subthreshold swing of the BP-MoS2 TFET reached 65 mV/dec at room temperature and 51 mV/dec at 160 K, maintaining low SS values in more than 2 orders of drain current range. The demonstrated interband TFET based on the BP-MoS2 junction shows significant promise for further application to a new class of two-dimensional functional devices.

  13. Low-frequency switching in a transistor amplifier.

    PubMed

    Carroll, T L

    2003-04-01

    It is known from extensive work with the diode resonator that the nonlinear properties of a P-N junction can lead to period doubling, chaos, and other complicated behaviors in a driven circuit. There has been very little work on what happens when more than one P-N junction is present. In this work, the first step towards multiple P-N junction circuits is taken by doing both experiments and simulations with a single-transistor amplifier using a bipolar transistor. Period doubling and chaos are seen when the amplifier is driven with signals between 100 kHz and 1 MHz, and they coincide with a very low frequency switching between different period doubled (or chaotic) wave forms. The switching frequencies are between 5 and 10 Hz. The switching behavior was confirmed in a simplified model of the transistor amplifier.

  14. Superconducting transistor

    DOEpatents

    Gray, Kenneth E.

    1979-01-01

    A superconducting transistor is formed by disposing three thin films of superconducting material in a planar parallel arrangement and insulating the films from each other by layers of insulating oxides to form two tunnel junctions. One junction is biased above twice the superconducting energy gap and the other is biased at less than twice the superconducting energy gap. Injection of quasiparticles into the center film by one junction provides a current gain in the second junction.

  15. Femtosecond energy relaxation of nonthermal electrons injected in p-doped GaAs base of a heterojunction bipolar transistor

    NASA Astrophysics Data System (ADS)

    Prabhu, S. S.; Vengurlekar, A. S.

    2001-07-01

    We study femtosecond relaxation of minority carriers (electrons) injected into a heavily p-doped base of a heterojunction bipolar transistor (HBT). Here, we consider the case of p-doped GaAs, to be specific. The electrons are assumed to have a peaked energy distribution at t=0, with kinetic energies a few hundred meV above the conduction band threshold. We solve the time dependent Boltzmann equation governing the dynamics of these electrons. The main feature of this work is a detailed calculation of the time dependent nonthermal, nonequilibrium electron energy distribution, that relaxes due to single particle excitations via electron-hole scattering and interaction with coupled optical phonon-hole plasmon modes in the sub and picosecond time domains. We highlight the significant role that the electron-hole scattering plays in this relaxation. The majority carriers (holes) are assumed to remain in quasiequilibrium with the lattice, taken to be at room temperature (or at 77 K). We present calculations of electron energy relaxation with the hole density varied from 1×1018 to 1×1020cm-3. In the initial, subpicosecond stages of the relaxation, the energy distribution evolves into two major components: a quasiballistic but broad component, at energies near the injection energy, and an energy relaxed component near E=0. The latter becomes dominant in a picosecond or so. The electrons with an initial mean velocity of ˜1.5×108cm/s attain a cooler distribution with a mean velocity of ˜4×107 cm/s within about 1 ps for p doping in excess of 1×1019 cm-3. The temporal evolution of average velocity of the electrons should be useful in obtaining values of the base width suitable for effective operation of HBTs.

  16. Collector-up aluminum gallium arsenide/gallium arsenide heterojunction bipolar transistors using oxidized aluminum arsenide for current confinement

    NASA Astrophysics Data System (ADS)

    Massengale, Alan Ross

    1998-12-01

    The discovery in 1990 that the wet thermal oxidation of AlAs can create a stable native oxide has added a new constituent, AlAs-oxide, to the AlGaAs/GaAs materials system. Native oxides of high Al mole-fraction AlGaAs are being used to confine electrical and/or optical fields in many types of electronic and optoelectronic structures with very promising results. Among these devices are collector-up heterojunction bipolar transistors (HBTs). Collector-up HBTs offer a means to reduce base-collector capacitance relative to their emitter-up counterparts, and thus to improve device performance. A novel method for fabricating collector-up AlGaAs/GaAs HBTs where an AlAs layer is inserted into the emitter layer and is oxidized in water vapor at 450sp°C has been developed. The resulting AlAs-oxide serves as a current confining layer that constricts collector current flow to the intrinsic portion of the device. Compared to previous methods of fabricating these devices, the process of converting AlAs into an insulator requires only one growth, and does not suffer from implant damage in the base. Because the lateral oxidation of AlAs is a process that proceeds at rates of microns per minute, one of the major challenges facing its implementation is the ability to accurately control the oxidation rate over the wafer, and from one wafer to the next. In the course of work on the oxidation of AlAs, a method to lithographically form lateral oxidation stop layers has been achieved. This technique utilizes impurity induced layer disordering (IILD) in heavily Si-doped buried planes, combined with selective surface patterning and thermal annealing, to create a lateral variation in the Al mole-fraction of the layer to be oxidized.

  17. On the Emitter Resistance of High-Performance GaAs- and InP-Based Heterojunction Bipolar Transistors

    NASA Astrophysics Data System (ADS)

    Matsuoka, Yutaka; Ohkubo, Yukio; Matsumoto, Taisuke; Koji, Takashi; Amano, Yoshiaki; Takagi, Akio

    2008-06-01

    Emitter resistance REE and collector current ideality factor nC of InGaP/GaAs heterostructure bipolar transistors (HBTs) and InP/InGaAs double-HBTs (DHBTs) were investigated from the viewpoints of DC and RF characteristics. It was found that the apparent ideality factor of collector current nCapp increases with the collector current IC for all HBTs. The increase in nCapp is more conspicuous in the InP/InGaAs DHBTs than in the InGaP/GaAs HBTs. The most likely explanation is that the REE consists of two components: one is the well-known contact resistivity REE0 and the other is band-profile-dependent resistivity REi, which decreases as IC increases. In the InP/InGaAs DHBTs, the increase in nCapp with IC is made remarkable by the insertion of an InGaAs etching stop layer (ESL) that makes it easy to form a ledge structure indispensable for high-reliability and high-performance HBTs. However, with the increase of IC, the difference in REE between the InP/InGaAs DHBTs with and without the ESL becomes small. The insertion of an ESL is considered acceptable for high-speed IC applications. Using an emitter structure with an ESL, we developed self-aligned InP/InGaAs DHBTs with a ledge passivation structure that attained an fT of 302 GHz, fmax of 388 GHz, and BVCEO of 6.2 V.

  18. Compact model for non-local avalanche effect in advanced bipolar transistors: An assessment of the relaxation length and its temperature dependence

    NASA Astrophysics Data System (ADS)

    Setekera, Robert; van der Toorn, Ramses

    2016-05-01

    We present a physics based compact model formulation for non-local avalanche effects. It is explicit and in terms of elementary functions, hence suitable for implementation in existing compact transistor models. The formulation has only two material coefficients as parameters: the energy relaxation length and its temperature coefficient. We present a detailed verification of our model against measured avalanche characteristics, as a function of both bias and temperature, for Si and SiGe industrial bipolar transistors. We demonstrate that the model is complete and accurate enough for the parameter extraction to be taken as an in situ measurement for both the electron energy relaxation length and its temperature coefficient: values obtained correspond to the values published earlier in the semiconductor literature.

  19. Influence of doping dependent bandgap grading on electrical performance and design criteria of npn Al zGa 1-zAs/GaAs abrupt heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Mohammad, S. Noor

    1990-03-01

    Current-voltage characteristics of npn Al zGa 1- zAs/GaAs abrupt heterojunction bipolar transistors (HBTs) with nonuniform doping in the emitter and the base has been studied in some details. For the calculation of these characteristics the effects of both conduction band potential spike ΔEb and valence band discontinuity ΔEv have been taken into account. The extra electric field generated due to nonuniform base doping accelerates the flow of electrons, and minimizes the effect of ΔEv on the electron current density Jc.

  20. Effect of Si interface surface roughness to the tunneling current of the Si/Si{sub 1-x}Ge{sub x}/Si heterojunction bipolar transistor

    SciTech Connect

    Hasanah, Lilik Suhendi, Endi; Tayubi, Yuyu Rahmat; Yuwono, Heru; Nandiyanto, Asep Bayu Dani; Murakami, Hideki; Khairrurijal

    2016-02-08

    In this work we discuss the surface roughness of Si interface impact to the tunneling current of the Si/Si{sub 1-x}Ge{sub x}/Si heterojunction bipolar transistor. The Si interface surface roughness can be analyzed from electrical characteristics through the transversal electron velocity obtained as fitting parameter factor. The results showed that surface roughness increase as Ge content of virtual substrate increase This model can be used to investigate the effect of Ge content of the virtual substrate to the interface surface condition through current-voltage characteristic.

  1. Heavy-ion broad-beam and microprobe studies of single-event upsets in 0.20 um SiGe heterojunction bipolar transistors and circuits.

    SciTech Connect

    Fritz, Karl; Irwin, Timothy J.; Niu, Guofu; Fodness, Bryan; Carts, Martin A.; Marshall, Paul W.; Reed, Robert A.; Gilbert, Barry; Randall, Barbara; Prairie, Jason; Riggs, Pam; Pickel, James C.; LaBel, Kenneth; Cressler, John D.; Krithivasan, Ramkumar; Dodd, Paul Emerson; Vizkelethy, Gyorgy

    2003-09-01

    Combining broad-beam circuit level single-event upset (SEU) response with heavy ion microprobe charge collection measurements on single silicon-germanium heterojunction bipolar transistors improves understanding of the charge collection mechanisms responsible for SEU response of digital SiGe HBT technology. This new understanding of the SEU mechanisms shows that the right rectangular parallele-piped model for the sensitive volume is not applicable to this technology. A new first-order physical model is proposed and calibrated with moderate success.

  2. Analytical description of the injection ratio of self-biased bipolar transistors under the very high injection conditions of ESD events

    NASA Astrophysics Data System (ADS)

    Gendron, A.; Renaud, P.; Bafleur, M.; Nolhier, N.

    2008-05-01

    This paper proposes a 1D-analytical description of the injection ratio of a self-biased bipolar transistor under very high current injection conditions. Starting from an expression of the current gain based on the stored charge into the emitter and base regions, we derive a new analytical expression of the current injection ratio. This analytical description demonstrates the presence of an asymptotic limit for the injection ratio at very high current densities, as the ratio of electron/hole mobilities in the case of an NPN transistor and to the ratio of hole/electron saturation velocities for a PNP. Moreover, for the first time, a base narrowing effect is demonstrated and explained in the case of a self-biased PNP, in contrast with the base widening effect (Kirk effect [Kirk CT, A theory of transistor cutoff frequency (fT) falloff at high current densities, IRE Trans Electr Dev 1961: p. 164-73]) reported for lower current density. These results are validated by numerical simulation and show a good agreement with experimental characterizations of transistors especially designed to operate under extreme condition such as electrostatic discharge (ESD) events.

  3. Effects of orientation of substrate on the enhanced low-dose-rate sensitivity (ELDRS) in NPN transistors

    NASA Astrophysics Data System (ADS)

    Lu, Wu; Zheng, Yu-Zhan; Wang, Yi-Yuan; Ren, Di-Yuan; Guo, Qi; Wang, Zhi-Kuan; Wang, Jian-An

    2011-02-01

    The radiation effects and annealing characteristics of two types of domestic NPN bipolar junction transistors, fabricated with different orientations, were investigated under different dose-rate irradiation. The experimental results show that both types of the NPN transistors exhibit remarkable Enhanced Low-Dose-Rate Sensitivity (ELDRS). After irradiation at high or low dose rate, the excess base current of NPN transistors obviously increased, and the current gain would degrade rapidly. Moreover, the decrease of collector current was also observed. The NPN transistor with <111> orientation was more sensitive to ionizing radiation than that with <100> orientation. The underlying mechanisms of various experimental phenomena are discussed in detail in this paper.

  4. Evaluation of GaAs Schottky gate bipolar transistor (SGBT) by electrothermal simulation

    NASA Astrophysics Data System (ADS)

    Hossin, M.; Johnson, C. M.; Wright, N. G.; O'Neill, A. G.

    2000-01-01

    A GaAs alternative to the Si IGBT, employing an implanted lateral channel in place of the usual MOSFET inversion channel, is proposed. A simplified analytical model shows that the relatively high ratio of electron to hole mobility in GaAs allows much lower anode emitter injection efficiencies to be used without compromising conductivity modulation of the base region. This, in turn, means that a higher proportion of the total device current is carried by electrons. Design strategies for the GaAs SGBT are investigated and applied in the design of an optimised unit cell. The optimised structure is compared with an equivalent Si IGBT structure by means of electrothermal and transient simulation. Electrothermal simulation shows the GaAs device to have useable performance at junction temperatures in excess of 300°C, a feature which is consistent with the wide band-gap of GaAs. Transient simulations show reduced minority carrier tailing effects at both turn-on and turn-off, with initial turn-off tail currents being reduced by a factor of 5 compared to the Si IGBT. The resulting reduction in turn-off loss allows switching frequencies to be increased by a factor of 4 for the same total losses. The excellent switching performance derives from the relatively low proportion of hole current needed to ensure effective conductivity modulation of the structure.

  5. Radiation effect on silicon transistors in mixed neutrons-gamma environment

    NASA Astrophysics Data System (ADS)

    Assaf, J.; Shweikani, R.; Ghazi, N.

    2014-10-01

    The effects of gamma and neutron irradiations on two different types of transistors, Junction Field Effect Transistor (JFET) and Bipolar Junction Transistor (BJT), were investigated. Irradiation was performed using a Syrian research reactor (RR) (Miniature Neutron Source Reactor (MNSR)) and a gamma source (Co-60 cell). For RR irradiation, MCNP code was used to calculate the absorbed dose received by the transistors. The experimental results showed an overall decrease in the gain factors of the transistors after irradiation, and the JFETs were more resistant to the effects of radiation than BJTs. The effect of RR irradiation was also greater than that of gamma source for the same dose, which could be because neutrons could cause more damage than gamma irradiation.

  6. Efficient light output power for InGaP/GaAs heterojunction bipolar transistors incorporated with InGaAs quantum wells

    NASA Astrophysics Data System (ADS)

    Huang, Tzu-Hsuan; Wu, Meng-Chyi

    2016-07-01

    In this work, the current gain and optical frequency response of the heterojunction bipolar transistor (HBT) and heterojunction bipolar light-emitting transistor (HBLET) are investigated. Compared to the conventional HBT, two-pair quantum wells are embedded in the base region of the HBLET. The current gain of HBLET increases with temperature, which shows dissimilar electrical properties to the HBT. Although the current gain of HBLET is much smaller than that of HBT, the decrement of current gain is converted to enhance the light output power. The light output power of HBLET can reach 0.96 mW at 90 mA. The HBLET exhibits the 3-dB bandwidths (f3dB) of 554 and 559 MHz at 30 and 50 mA, respectively. It is found that the 3-dB frequency is proportional to the square root of base current density, while the minority carrier lifetime is inversely proportional to the square root of base current density. Therefore, our results suggest that HBLET with the high light output power shows a great potential in the short range optical data communications.

  7. Femtosecond energy relaxation of nonthermal electrons injected in p-doped GaAs base of a heterojunction bipolar transistor

    SciTech Connect

    Prabhu, S. S.; Vengurlekar, A. S.

    2001-07-01

    We study femtosecond relaxation of minority carriers (electrons) injected into a heavily p-doped base of a heterojunction bipolar transistor (HBT). Here, we consider the case of p-doped GaAs, to be specific. The electrons are assumed to have a peaked energy distribution at t=0, with kinetic energies a few hundred meV above the conduction band threshold. We solve the time dependent Boltzmann equation governing the dynamics of these electrons. The main feature of this work is a detailed calculation of the time dependent nonthermal, nonequilibrium electron energy distribution, that relaxes due to single particle excitations via electron{endash}hole scattering and interaction with coupled optical phonon-hole plasmon modes in the sub and picosecond time domains. We highlight the significant role that the electron-hole scattering plays in this relaxation. The majority carriers (holes) are assumed to remain in quasiequilibrium with the lattice, taken to be at room temperature (or at 77 K). We present calculations of electron energy relaxation with the hole density varied from 1{times}10{sup 18} to 1{times}10{sup 20}cm{sup {minus}3}. In the initial, subpicosecond stages of the relaxation, the energy distribution evolves into two major components: a quasiballistic but broad component, at energies near the injection energy, and an energy relaxed component near E=0. The latter becomes dominant in a picosecond or so. The electrons with an initial mean velocity of {similar_to}1.5{times}10{sup 8}cm/s attain a cooler distribution with a mean velocity of {similar_to}4{times}10{sup 7}cm/s within about 1 ps for p doping in excess of 1{times}10{sup 19}cm{sup {minus}3}. The temporal evolution of average velocity {l_angle}v{r_angle} of the electrons should be useful in obtaining values of the base width suitable for effective operation of HBTs. {copyright} 2001 American Institute of Physics.

  8. Method and apparatus for increasing resistance of bipolar buried layer integrated circuit devices to single-event upsets

    NASA Technical Reports Server (NTRS)

    Zoutendyk, John A. (Inventor)

    1991-01-01

    Bipolar transistors fabricated in separate buried layers of an integrated circuit chip are electrically isolated with a built-in potential barrier established by doping the buried layer with a polarity opposite doping in the chip substrate. To increase the resistance of the bipolar transistors to single-event upsets due to ionized particle radiation, the substrate is biased relative to the buried layer with an external bias voltage selected to offset the built-in potential just enough (typically between about +0.1 to +0.2 volt) to prevent an accumulation of charge in the buried-layer-substrate junction.

  9. Progress Towards High-Sensitivity Arrays of Detectors of Sub-mm Radiation Using Superconducting Tunnel Junctions with Integrated Radio Frequency Single-Electron Transistors

    NASA Technical Reports Server (NTRS)

    Stevenson, T. R.; Hsieh, W.-T.; Li, M. J.; Prober, D. E.; Rhee, K. W.; Schoelkopf, R. J.; Stahle, C. M.; Teufel, J.; Wollack, E. J.

    2004-01-01

    For high resolution imaging and spectroscopy in the FIR and submillimeter, space observatories will demand sensitive, fast, compact, low-power detector arrays with 104 pixels and sensitivity less than 10(exp -20) W/Hz(sup 0.5). Antenna-coupled superconducting tunnel junctions with integrated rf single-electron transistor readout amplifiers have the potential for achieving this high level of sensitivity, and can take advantage of an rf multiplexing technique. The device consists of an antenna to couple radiation into a small superconducting volume and cause quasiparticle excitations, and a single-electron transistor to measure current through junctions contacting the absorber. We describe optimization of device parameters, and results on fabrication techniques for producing devices with high yield for detector arrays. We also present modeling of expected saturation power levels, antenna coupling, and rf multiplexing schemes.

  10. Normal metal tunnel junction-based superconducting quantum interference proximity transistor

    SciTech Connect

    D'Ambrosio, Sophie Meissner, Martin; Blanc, Christophe; Ronzani, Alberto; Giazotto, Francesco

    2015-09-14

    We report the fabrication and characterization of an alternative design for a superconducting quantum interference proximity transistor (SQUIPT) based on a normal metal (N) probe. The absence of direct Josephson coupling between the proximized metal nanowire and the N probe allows us to observe the full modulation of the wire density of states around zero voltage and current via the application of an external magnetic field. This results into a drastic suppression of power dissipation which can be as low as a few ∼10{sup −17} W. In this context, the interferometer allows an improvement of up to four orders of magnitude with respect to earlier SQUIPT designs and makes it ideal for extra-low power cryogenic applications. In addition, the N-SQUIPT has been recently predicted to be the enabling candidate for the implementation of coherent caloritronic devices based on proximity effect.

  11. Plasma Separation Process: Betacell (BCELL) code: User's manual. [Bipolar barrier junction

    SciTech Connect

    Taherzadeh, M.

    1987-11-13

    The emergence of clearly defined applications for (small or large) amounts of long-life and reliable power sources has given the design and production of betavoltaic systems a new life. Moreover, because of the availability of the plasma separation program, (PSP) at TRW, it is now possible to separate the most desirable radioisotopes for betacell power generating devices. A computer code, named BCELL, has been developed to model the betavoltaic concept by utilizing the available up-to-date source/cell parameters. In this program, attempts have been made to determine the betacell energy device maximum efficiency, degradation due to the emitting source radiation and source/cell lifetime power reduction processes. Additionally, comparison is made between the Schottky and PN junction devices for betacell battery design purposes. Certain computer code runs have been made to determine the JV distribution function and the upper limit of the betacell generated power for specified energy sources. A Ni beta emitting radioisotope was used for the energy source and certain semiconductors were used for the converter subsystem of the betacell system. Some results for a Promethium source are also given here for comparison. 16 refs.

  12. Electrical detection of the biological interaction of a charged peptide via gallium arsenide junction-field-effect transistors

    NASA Astrophysics Data System (ADS)

    Lee, Kangho; Nair, Pradeep R.; Alam, Muhammad A.; Janes, David B.; Wampler, Heeyeon P.; Zemlyanov, Dmitry Y.; Ivanisevic, Albena

    2008-06-01

    GaAs junction-field-effect transistors (JFETs) are utilized to achieve label-free detection of biological interaction between a probe transactivating transcriptional activator (TAT) peptide and the target trans-activation-responsive (TAR) RNA. The TAT peptide is a short sequence derived from the human immunodeficiency virus-type 1 TAT protein. The GaAs JFETs are modified with a mixed adlayer of 1-octadecanethiol (ODT) and TAT peptide, with the ODT passivating the GaAs surface from polar ions in physiological solutions and the TAT peptide providing selective binding sites for TAR RNA. The devices modified with the mixed adlayer exhibit a negative pinch-off voltage (VP) shift, which is attributed to the fixed positive charges from the arginine-rich regions in the TAT peptide. Immersing the modified devices into a TAR RNA solution results in a large positive VP shift (>1 V) and a steeper subthreshold slope (˜80 mV/decade), whereas "dummy" RNA induced a small positive VP shift (˜0.3 V) without a significant change in subthreshold slopes (˜330 mV/decade). The observed modulation of device characteristics is analyzed with analytical modeling and two-dimensional numerical device simulations to investigate the electronic interactions between the GaAs JFETs and biological molecules.

  13. Electrical detection of the biological interaction of a charged peptide via gallium arsenide junction-field-effect transistors.

    PubMed

    Lee, Kangho; Nair, Pradeep R; Alam, Muhammad A; Janes, David B; Wampler, Heeyeon P; Zemlyanov, Dmitry Y; Ivanisevic, Albena

    2008-06-01

    GaAs junction-field-effect transistors (JFETs) are utilized to achieve label-free detection of biological interaction between a probe transactivating transcriptional activator (TAT) peptide and the target trans-activation-responsive (TAR) RNA. The TAT peptide is a short sequence derived from the human immunodeficiency virus-type 1 TAT protein. The GaAs JFETs are modified with a mixed adlayer of 1-octadecanethiol (ODT) and TAT peptide, with the ODT passivating the GaAs surface from polar ions in physiological solutions and the TAT peptide providing selective binding sites for TAR RNA. The devices modified with the mixed adlayer exhibit a negative pinch-off voltage (V(P)) shift, which is attributed to the fixed positive charges from the arginine-rich regions in the TAT peptide. Immersing the modified devices into a TAR RNA solution results in a large positive V(P) shift (>1 V) and a steeper subthreshold slope ( approximately 80 mVdecade), whereas "dummy" RNA induced a small positive V(P) shift ( approximately 0.3 V) without a significant change in subthreshold slopes ( approximately 330 mVdecade). The observed modulation of device characteristics is analyzed with analytical modeling and two-dimensional numerical device simulations to investigate the electronic interactions between the GaAs JFETs and biological molecules.

  14. Common-base multi-finger submicron InGaAs/InP double heterojunction bipolar transistor with fmax of 305 GHz

    NASA Astrophysics Data System (ADS)

    Jin, Z.; Su, Y.; Cheng, W.; Liu, X.; Xu, A.; Qi, M.

    2008-11-01

    A layout of a common-base four-finger InGaAs/InP double heterostructure bipolar transistor (DHBT) has been designed and the corresponding DHBT has been fabricated successfully by using planarization technology. The area of each emitter finger was 1 × 15 μm2. The breakdown voltage was more than 7 V, the current could be more than 100 mA. The maximum output power can be more than 80 mW derived from the DC characteristics. The maximum oscillation frequency was as high as 305 GHz at IC = 50 mA and VCB = 1.5 V. The DHBT is thus promising for the medium power amplifier and voltage controlled oscillator (VCO) applications at W band and higher frequencies.

  15. NpN-GaN/InxGa1-xN/GaN heterojunction bipolar transistor on free-standing GaN substrate

    NASA Astrophysics Data System (ADS)

    Lochner, Zachary; Jin Kim, Hee; Lee, Yi-Che; Zhang, Yun; Choi, Suk; Shen, Shyh-Chiang; Doug Yoder, P.; Ryou, Jae-Hyun; Dupuis, Russell D.

    2011-11-01

    Data and analysis are presented for NpN-GaN/InGaN/GaN double-heterojunction bipolar transistors (HBTs) grown and fabricated on a free-standing GaN (FS-GaN) substrate in comparison to that on a sapphire substrate to investigate the effect of dislocations in III-nitride HBT epitaxial structures. The performance characteristics of HBTs on FS-GaN exhibit a maximum collector current density of ˜12.3 kA/cm2, dc current gain of ˜90, and maximum differential gain of ˜120 without surface passivation, representing a substantial improvement over similar devices grown on sapphire. This is attributed to the reduction in threading dislocation density afforded by using a homoepitaxial growth on a high-crystalline-quality substrate. The minority carrier diffusion length increases significantly owing to not only a mitigated carrier trap effect via fewer dislocations, but also possibly reduced microscopic localized states.

  16. A New 600 V Punch Through-Insulated Gate Bipolar Transistor with the Monolithic Fault Protection Circuit Using the Floating p-Well Voltage Detection

    NASA Astrophysics Data System (ADS)

    Ji, In-Hwan; Jeon, Byung-Chul; Choi, Young-Hwan; Ha, Min-Woo; Han, Min-Koo

    2006-10-01

    A new fault sensing scheme of the insulated gate bipolar transistor (IGBT) employing the floating p-well, which detects the over-voltage of the floating p-well under the short circuit fault condition, is proposed and implemented by fabricating the main IGBT and gate voltage pull-down circuit using the widely used planar IGBT process. The floating p-well structure also improves the avalanche energy of IGBT in addition to detecting the fault signal. The detection of fault and gate voltage pull-down operation is achieved by the proposed fault protection scheme employing the floating p-well voltage detection. The proposed fault protection circuit was measured under the hard switching fault (HSF) and fault under load (FUL) conditions. The normal switching behavior of the main IGBT with the proposed protection circuit was also investigated under inductive load switching conditions.

  17. On the AlGaInP-bulk and AlGaInP/GaAs-superlattice confinement effects for heterostructure-emitter bipolar transistors

    SciTech Connect

    Tsai, Jung-Hui

    2015-02-09

    The confinement effect and electrical characteristics of heterostructure-emitter bipolar transistors with an AlGaInP bulk-confinement layer and an AlGaInP/GaAs superlattice-confinement layer are first demonstrated and compared by experimentally results. In the two devices, the relatively large valence band discontinuity at AlGaInP/GaAs heterojunction provides excellent confinement effect for holes to enhance current gain. As to the AlGaInP/GaAs superlattice-confinement device, part of thermionic-emission electrons will be trapped in the GaAs quantum wells of the superlattice. This will result in lower collector current and current gain as compared with the bulk-confinement device. Nevertheless, the superlattice-confinement device exhibits a larger current-gain cutoff frequency, which can be attributed that the tunneling behavior is included in the carrier transportation and transporting time across the emitter region could be substantially reduced.

  18. Enhanced Miller plateau characteristics of a 4H-SiC insulated-gate bipolar transistor in the presence of interface traps

    NASA Astrophysics Data System (ADS)

    Navarro, Dondee; Tone, Akihiro; Kikuchihara, Hideyuki; Morikawa, Yoji; Miura-Mattausch, Mitiko

    2017-04-01

    Miller plateau characteristics of a 4H-SiC insulated-gate bipolar transistor (IGBT) is investigated during a gate voltage turn-on under the presence of interface carrier traps at the MOSFET gate oxide. The plateau, which is observed in the device gate-emitter voltage, increased with respect to both height and length. The plateau height is mainly determined by the density increase of trap states, which also causes slow charging of the gate capacitance in the overlap region that results in a longer plateau length. The shallow trap states contribute mainly to the plateau increase. It is observed that the switching loss at turn-on can increase by more than 60% due mainly to the carrier traps at the shallow trap states.

  19. Investigation of 4H-SiC insulated-gate bipolar transistor turn-off performance for achieving low power loss

    NASA Astrophysics Data System (ADS)

    Navarro, Dondee; Pesic, Iliya; Morikawa, Yoji; Furui, Yoshiharu; Miura-Mattausch, Mitiko

    2016-04-01

    The dynamic characteristics of a 4H-SiC insulated-gate bipolar transistor (IGBT) at pulse switching is investigated by incorporating reported measurements of the interface defect density to device simulation. Different trap features such as energy states and trap time constants are investigated to determine the influence of traps on circuit performance. The capture cross-section parameter used in the simulation depicts the probability of traps to trap/detrap carriers which relates to the carrier trap time constant. It is demonstrated that trapped carriers from the on-state condition cause enhanced generation current during the off-state condition, which give rise to undesired leakage current in addition to the threshold voltage shift previously reported. The device power dissipation is increased by a factor of 100 due to the defects.

  20. Surface roughness in sulfur ion-implanted InP with molecular beam epitaxy regrown double-heterojunction bipolar transistor layers

    SciTech Connect

    Hu, T.-C.; Chang, M.F.; Weimann, Nils; Chen Jianxin; Chen, Y.-K.

    2005-04-04

    We report on deep ion-implantation of sulfur into InP substrates to replace the epitaxial subcollector layer of double-heterojunction bipolar transistors. Using optimized implantation conditions of 350 keV energy and 1x10{sup 15} cm{sup -2} dose, we achieved a subcollector sheet resistance of 15 {omega}/square. Under well-controlled regrowth conditions a root-mean-square roughness of 12 A is measured from DHBT epitaxial layers grown on implanted InP substrates, comparable to DHBT epitaxial layers grown on n{sup +} epiready unimplanted substrates. We observe a pronounced increase in surface roughness of epitaxial layer beyond a threshold ion dose, depending on implantation energy. Large-area DHBT devices result with sulfur-ion implanted subcollector shows similar characteristics compared to devices fabricated on n{sup +}-doped InP substrates.

  1. Numerical investigation of temperature field Induced by dual wavelength lasers in sub-microsecond laser annealing technology for insulated gate bipolar transistor

    NASA Astrophysics Data System (ADS)

    Cui, GuoDong; Ma, Mingying; Wang, Fan; Sun, Gang; Lan, Yanping; Xu, Wen

    2015-07-01

    To enhance the performance of the Insulated Gate Bipolar Transistor (IGBT), sub-microsecond laser annealing (LA) is propitious to achieve maximal dopant activation with minimal diffusion. In this work, two different lasers are used as annealing resource: a continuous 808 nm laser with larger spot is applied to preheat the wafer and another sub-microsecond pulsed 527 nm laser is responsible to activate the dopant. To optimize the system's performance, a physical model is presented to predict the thermal effect of two laser fields interacting on wafer. Using the Finite-Element method (FEM), we numerically investigate the temperature field induced by lasers in detail. The process window corresponding to the lasers is also acquired which can satisfy the requirements of the IGBT's annealing.

  2. Switching characteristics of a 4H-SiC insulated-gate bipolar transistor with interface defects up to the nonquasi-static regime

    NASA Astrophysics Data System (ADS)

    Pesic, Iliya; Navarro, Dondee; Fujinaga, Masato; Furui, Yoshiharu; Miura-Mattausch, Mitiko

    2015-04-01

    The switching characteristics of a trench-type 4H-SiC insulated-gate bipolar transistor (IGBT) device with interface defects are analyzed up to the nonquasi-static (NQS) switching regime using reported interface density measurements and device simulation. Collector current degradation characterized by threshold voltage shift to higher gate voltages and reduction of current magnitude due to carrier trapping are observed under quasi-static (QS) simulation condition. At slow switching of the gate voltage, carrier trapping causes a hump in the transient current at the start of conduction. At very fast switching, the current hump is limited by the NQS effect which results to a reduced switching efficiency and increased on-resistance.

  3. DC and High Frequency Characterization of Metalorganic Chemical Vapor Deposition (MOCVD) Grown InP/InGaAs PNP Heterojunction Bipolar Transistor

    NASA Astrophysics Data System (ADS)

    Cui, Delong; Hsu, Shawn S. H.; Pavlidis, Dimitris

    2002-02-01

    InP/InGaAs PNP heterojunction bipolar transistor (HBT) layers have been grown by metalorganic chemical vapor deposition (MOCVD) and devices have been fabricated using a self-aligned processing technology. A zinc-doped InP layer has been employed as the wide-bandgap emitter layer for the PNP HBT. The base layer used a 500 Å thick n-type InGaAs layer doped at 5× 1018 cm-3. Successful high frequency operation of these devices has been demonstrated. A single-emitter 1× 20 μm2 MOCVD-grown PNP InP/InGaAs HBT achieved current gain cutoff frequency (fT) of more than 11 GHz at a current density (JC) of 8.25× 104 A/cm2.

  4. Analysis of different tunneling mechanisms of In{sub x}Ga{sub 1−x}As/AlGaAs tunnel junction light-emitting transistors

    SciTech Connect

    Wu, Cheng-Han; Wu, Chao-Hsin

    2014-10-27

    The electrical and optical characteristics of tunnel junction light-emitting transistors (TJLETs) with different indium mole fractions (x = 5% and 2.5%) of the In{sub x}Ga{sub 1−x}As base-collector tunnel junctions have been investigated. Two electron tunneling mechanisms (photon-assisted or direct tunneling) provide additional currents to electrical output and resupply holes back to the base region, resulting in the upward slope of I-V curves and enhanced optical output under forward-active operation. The larger direct tunneling probability and stronger Franz-Keldysh absorption for 5% TJLET lead to higher collector current slope and less optical intensity enhancement when base-collector junction is under reverse-biased.

  5. Heavily doped transparent-emitter regions in junction solar cells, diodes, and transistors

    NASA Technical Reports Server (NTRS)

    Shibib, M. A.; Lindholm, F. A.; Therez, F.

    1979-01-01

    The paper presents an analytical treatment of transparent-emitter devices, particularly solar cells, that is more complete than previously available treatments. The proposed approach includes the effects of bandgap narrowing, Fermi-Dirac statistics, built-in field due to impurity profile, and a finite surface recombination velocity at the emitter surface. It is demonstrated that the transparent-emitter model can predict experimental values of Voc observed on n(plus)-p thin diffused junction silicon solar cells made on low-resistivity (0.1 ohm-cm) substrates. A test is included for the self-consistent validity of the transparent-emitter model. This test compares the calculated transit time of minority carriers across the emitter with the Auger-impact minority-carrier lifetime within the emitter region.

  6. Silicon/silicon germanium heterostructures: Materials, physics, quantum functional devices and their integration with heterostructure bipolar transistors

    NASA Astrophysics Data System (ADS)

    Chung, Sung-Yong

    With the advent of the first transistor in 1947, the integrated circuit (IC) industry has rapidly expanded with the tremendous advances in the development of IC technology. The driving force in the evolution of IC technology is the reduction of transistor sizes. Without a doubt, transistor miniaturization will face fundamental physical limitations imposed by further dimensional scaling of silicon transistors in the near future. According to the 2004 International Technology Roadmap for Semiconductors (ITRS), the width of a gate electrode for complementary metal-oxide-semiconductor (CMOS) is projected to be a mere 7 nm by the end of 2018. No further solutions have been found. Since the 2001 ITRS, tunneling devices have been evaluated as an emerging technology to augment silicon CMOS. Transistor circuitry incorporating tunneling devices realized using III-V semiconductors has exhibited superior performance over its transistor-only counterparts. However, due to fundamental differences in material properties, such technology is not readily compatible with the mainstream platforms (>95% market share of semiconductors) of CMOS and HBT technologies. Recently, we demonstrated the successful monolithic integration of Si-based resonant interband tunnel diodes (RITDs) with CMOS and SiGe HBT, which makes them more attractive than III-V based tunnel diodes for system level integration. This dissertation is concerned with the development of quantum functional tunneling devices, RITDs, and high-speed transistors, HBTs, using Si/SiGe heterostructures as well as material growth and electrical properties of Si/SiGe heterostructures. Emphasis is placed on the development of Si/SiGe-based RITDs, HBTs, and their monolithic integration for 3-terminal negative differential resistance (NDR) devices. The operating principles of Si-based RITDs and the integration of RITD with HBT are also discussed.

  7. Design of a 2.7-GHz linear OTA and a 250-MHz elliptic filter in bipolar transistor-array technology

    NASA Astrophysics Data System (ADS)

    Wyszynski, Adam; Schaumann, Rolf; Szczepanski, Stanislaw; van Halen, Paul

    1993-01-01

    The design of a tunable high-frequency fully differential bipolar operational transconductance amplifier (OTA) is presented. Techniques resulting in tunability and broadbanding are discussed, as well as unavoidable tradeoffs resulting from the lack of a vertical pnp device. Using an 8 GHz bipolar transistor array process, the simulated -3 dB frequency of the OTA is over 2.7 GHz, the maximum linear input range is +/- 2.5 V, and the power dissipation is 28 mW for a power supply of +/- 5 V. The OTA can also operate at a low power supply of +/- 2.5 V. Applying the OTA as a building block, the design of a third-order elliptic OTA-C filter with cutoff frequency of 250 MHz and tuning range from 200 to 290 MHz is presented. Analysis of filter nonidealities, as well as predistortion and compensation techniques, are discussed. Detailed SPICE simulations verify the results of hand calculations and show that temperature variations from -30 to +100 C and supply variations from +/- 4.5 to +/- 7.5 V change the cutoff frequency of the filter by less than 10 percent. The Q-factor can be electronically adjusted for all frequencies in the tuning range.

  8. Oxide bipolar electronics: materials, devices and circuits

    NASA Astrophysics Data System (ADS)

    Grundmann, Marius; Klüpfel, Fabian; Karsthof, Robert; Schlupp, Peter; Schein, Friedrich-Leonhard; Splith, Daniel; Yang, Chang; Bitter, Sofie; von Wenckstern, Holger

    2016-06-01

    We present the history of, and the latest progress in, the field of bipolar oxide thin film devices. As such we consider primarily pn-junctions in which at least one of the materials is a metal oxide semiconductor. A wide range of n-type and p-type oxides has been explored for the formation of such bipolar diodes. Since most oxide semiconductors are unipolar, challenges and opportunities exist with regard to the formation of heterojunction diodes and band lineups. Recently, various approaches have led to devices with high rectification, namely p-type ZnCo2O4 and NiO on n-type ZnO and amorphous zinc-tin-oxide. Subsequent bipolar devices and applications such as photodetectors, solar cells, junction field-effect transistors and integrated circuits like inverters and ring oscillators are discussed. The tremendous progress shows that bipolar oxide electronics has evolved from the exploration of various materials and heterostructures to the demonstration of functioning integrated circuits. Therefore a viable, facile and high performance technology is ready for further exploitation and performance optimization.

  9. 'Junction-Level' Heterogeneous Integration of III-V Materials with Si CMOS for Novel Asymmetric Field-Effect Transistors

    NASA Astrophysics Data System (ADS)

    Chang, Yoon Jung

    Driven by Moore's law, semiconductor chips have become faster, denser and cheaper through aggressive dimension scaling. The continued scaling not only led to dramatic performance improvements in digital logic applications but also in mixed-mode and/or communication applications. Moreover, size/weight/power (SWAP) restrictions on all high-performance system components have resulted in multi-functional integration of multiple integrated circuits (ICs)/dies in 3D packages/ICs by various system-level approaches. However, these approaches still possess shortcomings and in order to truly benefit from the most advanced digital technologies, the future high-speed/high power devices for communication applications need to be fully integrated into a single CMOS chip. Due to limitations in Si device performance in high-frequency/power applications as well as expensive III-V compound semiconductor devices with low integration density, heterogeneous integration of compound semiconductor materials/devices with Si CMOS platform has emerged as a viable solution to low-cost high-performance ICs. In this study, we first discuss on channel and drain engineering approaches in the state-of-the-art multiple-gate field-effect transistor to integrate III-V compound semiconductor materials with Si CMOS for improved device performance in mixed-mode and/or communication applications. Then, growth, characterization and electrical analysis on small-area (diameter < 100nm) complete selective-area epitaxy of GaAs/GaN will be demonstrated for achieving 'dislocation-free' III-V compound semiconductor film on a Si(001) substrate. Based on a success in dislocation-free heterogeneous III-V film growth, we propose a novel ultra-scaled 'junction-level' heterogeneous integration onto mainstream Si CMOS platform. Device architecture and its key features to overcome aforementioned challenges will be given to demonstrate the potential to improve the overall system performance with diverse functionality.

  10. Evolution of the MOS transistor - From conception to VLSI

    NASA Astrophysics Data System (ADS)

    Sah, Chih-Tang

    1988-10-01

    Historical developments of the MOSFET during the last 60 years are reviewed, from the 1928 patent disclosures of the field-effect conductivity modulation concept and the semiconductor triode structures proposed by Lilienfeld to the 1947 Shockley-originated efforts which led to the laboratory demonstration of the modern silicon MOSFET in 1960. A survey is then made of the milestones of the past 30 years leading to the latest submicron silicon logic CMOS and BICMOS (bipolar-junction transistor CMOS combined) arrays and the three-dimensional and ferroelectric extensions of Dennard's one-transistor DRAM cell. The status of the submicron lithographic technologies is summarized. Future trends of memory cell density and logic gate speed are projected. Comparisons of the switching speed of the silicon MOSFET with that of silicon bipolar and GaAs FETs are reviewed.

  11. Modeling Low-Dose-Rate Effects in Irradiated Bipolar-Base Oxides

    SciTech Connect

    Cirba, C.R.; Fleetwood, D.M.; Graves, R.J.; Michez, A.; Milanowski, R.J.; Saigne, F.; Schrimpf, R.D.; Witczak, S.C.

    1998-10-26

    A physical model is developed to quantify the contribution of oxide-trapped charge to enhanced low-dose-rate gain degradation in bipolar junction transistors. Multiple-trapping simulations show that space charge limited transport is partially responsible for low-dose-rate enhancement. At low dose rates, more holes are trapped near the silicon-oxide interface than at high dose rates, resulting in larger midgap voltage shifts at lower dose rates. The additional trapped charge near the interface may cause an exponential increase in excess base current, and a resultant decrease in current gain for some NPN bipolar technologies.

  12. Experimental demonstration of single electron transistors featuring SiO{sub 2} plasma-enhanced atomic layer deposition in Ni-SiO{sub 2}-Ni tunnel junctions

    SciTech Connect

    Karbasian, Golnaz McConnell, Michael S.; Orlov, Alexei O.; Rouvimov, Sergei; Snider, Gregory L.

    2016-01-15

    The authors report the use of plasma-enhanced atomic layer deposition (PEALD) to fabricate single-electron transistors (SETs) featuring ultrathin (≈1 nm) tunnel-transparent SiO{sub 2} in Ni-SiO{sub 2}-Ni tunnel junctions. They show that, as a result of the O{sub 2} plasma steps in PEALD of SiO{sub 2}, the top surface of the underlying Ni electrode is oxidized. Additionally, the bottom surface of the upper Ni layer is also oxidized where it is in contact with the deposited SiO{sub 2}, most likely as a result of oxygen-containing species on the surface of the SiO{sub 2}. Due to the presence of these surface parasitic layers of NiO, which exhibit features typical of thermally activated transport, the resistance of Ni-SiO{sub 2}-Ni tunnel junctions is drastically increased. Moreover, the transport mechanism is changed from quantum tunneling through the dielectric barrier to one consistent with thermally activated resistors in series with tunnel junctions. The reduction of NiO to Ni is therefore required to restore the metal-insulator-metal (MIM) structure of the junctions. Rapid thermal annealing in a forming gas ambient at elevated temperatures is presented as a technique to reduce both parasitic oxide layers. This method is of great interest for devices that rely on MIM tunnel junctions with ultrathin barriers. Using this technique, the authors successfully fabricated MIM SETs with minimal trace of parasitic NiO component. They demonstrate that the properties of the tunnel barrier in nanoscale tunnel junctions (with <10{sup −15} m{sup 2} in area) can be evaluated by electrical characterization of SETs.

  13. High Accuracy Transistor Compact Model Calibrations

    SciTech Connect

    Hembree, Charles E.; Mar, Alan; Robertson, Perry J.

    2015-09-01

    Typically, transistors are modeled by the application of calibrated nominal and range models. These models consists of differing parameter values that describe the location and the upper and lower limits of a distribution of some transistor characteristic such as current capacity. Correspond- ingly, when using this approach, high degrees of accuracy of the transistor models are not expected since the set of models is a surrogate for a statistical description of the devices. The use of these types of models describes expected performances considering the extremes of process or transistor deviations. In contrast, circuits that have very stringent accuracy requirements require modeling techniques with higher accuracy. Since these accurate models have low error in transistor descriptions, these models can be used to describe part to part variations as well as an accurate description of a single circuit instance. Thus, models that meet these stipulations also enable the calculation of quantifi- cation of margins with respect to a functional threshold and uncertainties in these margins. Given this need, new model high accuracy calibration techniques for bipolar junction transis- tors have been developed and are described in this report.

  14. Single electron transistors with hydrogen treatment of ALD SiO2 in nanoscale metal-insulator-metal tunnel junctions.

    PubMed

    Karbasian, Golnaz; McConnell, Michael Steven; Orlov, Alexei; Nazarov, Alexei; Snider, Gregory

    2017-04-07

    Over the past five years, fabrication of metal-insulator-metal (MIM) single electron transistors (SET) featuring atomic layer deposition (ALD) of ultrathin tunnel barrier dielectrics (SiO2, Al2O3) has been reported. However, the performance of fabricated devices was significantly compromised by the presence of native metal oxide and problems associated with the nucleation of ALD dielectrics on metal substrates. To overcome the difficulty of dielectric ALD nucleation on metal substrates, we recently developed a fabrication technique in which the native metal oxide naturally forming in the presence of the ALD oxidant precursor is first used to promote the nucleation of ALD dielectrics, and then is chemically reduced by forming gas anneal (FGA) at temperatures near 400°C. However, despite the elimination of native oxide, low temperature characterization of the devices fabricated using FGA reveals excess "switching" noise of a very large magnitude resulting from charged defects within the junctions. It has been previously reported that remote hydrogen plasma (RHP) treatment of SiO2 thin films effectively eradicates fabrication defects. This work reports a comparative study of Ni-based MIM single electron transistors treated with FGA and/or RHP. We show that, using a combination of FGA and RHP treatments, it is possible to obtain MIM junctions free of switching noise and without a detectable contribution of native oxide.

  15. Progress Towards High-Sensitivity Arrays of Detectors of Sub-mm Radiation using Superconducting Tunnel Junctions with Radio-Frequency Single-Electron Transistors

    NASA Technical Reports Server (NTRS)

    Stevenson, T. R.; Hsieh, W.-T.; Li, M. J.; Stahle, C. M.; Wollack, E. J.; Schoelkopf, R. J.; Krebs, Carolyn (Technical Monitor)

    2002-01-01

    The science drivers for the SPIRIT/SPECS missions demand sensitive, fast, compact, low-power, large-format detector arrays for high resolution imaging and spectroscopy in the far infrared and submillimeter. Detector arrays with 10,000 pixels and sensitivity less than 10(exp 20)-20 W/Hz(exp 20)0.5 are needed. Antenna-coupled superconducting tunnel junction detectors with integrated rf single-electron transistor readout amplifiers have the potential for achieving this high level of sensitivity, and can take advantage of an rf multiplexing technique when forming arrays. The device consists of an antenna structure to couple radiation into a small superconducting volume and cause quasiparticle excitations, and a single-electron transistor to measure currents through tunnel junction contacts to the absorber volume. We will describe optimization of device parameters, and recent results on fabrication techniques for producing devices with high yield for detector arrays. We will also present modeling of expected saturation power levels, antenna coupling, and rf multiplexing schemes.

  16. A silicon nanocrystal tunnel field effect transistor

    NASA Astrophysics Data System (ADS)

    Harvey-Collard, Patrick; Drouin, Dominique; Pioro-Ladrière, Michel

    2014-05-01

    In this work, we demonstrate a silicon nanocrystal Field Effect Transistor (ncFET). Its operation is similar to that of a Tunnelling Field Effect Transistor (TFET) with two barriers in series. The tunnelling barriers are fabricated in very thin silicon dioxide and the channel in intrinsic polycrystalline silicon. The absence of doping eliminates the problem of achieving sharp doping profiles at the junctions, which has proven a challenge for large-scale integration and, in principle, allows scaling down the atomic level. The demonstrated ncFET features a 104 on/off current ratio at room temperature, a low 30 pA/μm leakage current at a 0.5 V bias, an on-state current on a par with typical all-Si TFETs and bipolar operation with high symmetry. Quantum dot transport spectroscopy is used to assess the band structure and energy levels of the silicon island.

  17. A silicon nanocrystal tunnel field effect transistor

    SciTech Connect

    Harvey-Collard, Patrick; Drouin, Dominique; Pioro-Ladrière, Michel

    2014-05-12

    In this work, we demonstrate a silicon nanocrystal Field Effect Transistor (ncFET). Its operation is similar to that of a Tunnelling Field Effect Transistor (TFET) with two barriers in series. The tunnelling barriers are fabricated in very thin silicon dioxide and the channel in intrinsic polycrystalline silicon. The absence of doping eliminates the problem of achieving sharp doping profiles at the junctions, which has proven a challenge for large-scale integration and, in principle, allows scaling down the atomic level. The demonstrated ncFET features a 10{sup 4} on/off current ratio at room temperature, a low 30 pA/μm leakage current at a 0.5 V bias, an on-state current on a par with typical all-Si TFETs and bipolar operation with high symmetry. Quantum dot transport spectroscopy is used to assess the band structure and energy levels of the silicon island.

  18. A dual-gate and dielectric-inserted lateral trench insulated gate bipolar transistor on a silicon-on-insulator substrate

    NASA Astrophysics Data System (ADS)

    Fu, Qiang; Zhang, Bo; Luo, Xiao-Rong; Li, Zhao-Ji

    2013-07-01

    In this paper, a novel dual-gate and dielectric-inserted lateral trench insulated gate bipolar transistor (DGDI LTIGBT) structure, which features a double extended trench gate and a dielectric inserted in the drift region, is proposed and discussed. The device can not only decrease the specific on-resistance Ron,sp, but also simultaneously improve the temperature performance. Simulation results show that the proposed LTIGBT achieves an ultra-low on-state voltage drop of 1.31 V at 700 A·cm-2 with a small half-cell pitch of 10.5 μm, a specific on-resistance Ron,sp of 187 mΩ·mm2, and a high breakdown voltage of 250 V. The on-state voltage drop of the DGDI LTIGBT is 18% less than that of the DI LTIGBT and 30.3% less than that of the conventional LTIGBT. The proposed LTIGBT exhibits a good positive temperature coefficient for safety paralleling to handling larger currents and enhances the short-circuit capability while maintaining a low self-heating effect. Furthermore, it also shows a better tradeoff between the specific on-resistance and the turnoff loss, although it has a longer turnoff delay time.

  19. Comparative investigation of InGaP/GaAs/GaAsBi and InGaP/GaAs heterojunction bipolar transistors

    SciTech Connect

    Wu, Yi-Chen; Tsai, Jung-Hui; Chiang, Te-Kuang; Wang, Fu-Min

    2015-10-15

    In this article the characteristics of In{sub 0.49}Ga{sub 0.51}P/GaAs/GaAs{sub 0.975}Bi{sub 0.025} and In{sub 0.49}Ga{sub 0.51}P/GaAs heterojunction bipolar transistor (HBTs) are demonstrated and compared by two-dimensional simulated analysis. As compared to the traditional InGaP/GaAs HBT, the studied InGaP/GaAs/GaAsBi HBT exhibits a higher collector current, a lower base-emitter (B–E) turn-on voltage, and a relatively lower collector-emitter offset voltage of only 7 mV. Because the more electrons stored in the base is further increased in the InGaP/GaAs/GaAsBi HBT, it introduces the collector current to increase and the B–E turn-on voltage to decrease for low input power applications. However, the current gain is slightly smaller than the traditional InGaP/GaAs HBT attributed to the increase of base current for the minority carriers stored in the GaAsBi base.

  20. High-Speed Uni-Traveling-Carrier Photodiodes Monolithically Integrated with InP Heterojunction Bipolar Transistors using Be Ion Implantation

    NASA Astrophysics Data System (ADS)

    Kashio, Norihide; Yamahata, Shoji; Ida, Minoru; Kurishima, Kenji; Sano, Kimikazu

    2006-10-01

    Uni-traveling-carrier photodiodes (UTC-PDs) can be monolithically integrated with InP heterojunction bipolar transistors (HBTs) using Be ion implantation and rapid thermal annealing (RTA) for an activation of implanted Be. UTC-PDs share the base and collector layers of the HBTs; the photoabsorption layer of the UTC-PD is formed by selectively doping the collector with Be. The fabricated UTC-PDs exhibit an output voltage of over 0.5 V and a 3-dB bandwidth of 100 GHz. The HBTs fabricated on the same wafer provide a peak ft of 150 GHz and a peak fmax of 250 GHz at a collector current density of 1 mA/μm2. The RTA used to fabricate the UTC-PDs does not seriously degrade the current gain of the HBTs. These results indicate that Be ion implantation is a promising technique for integrating UTC-PDs and InP HBTs on the same wafer.

  1. Device characteristics of the PnP AlGaAs/InGaAsN/GaAs double heterojunction bipolar transistor

    SciTech Connect

    CHANG,PING-CHIH; LI,N.Y.; LAROCHE,J.R.; BACA,ALBERT G.; HOU,H.Q.; REN,F.

    2000-02-09

    The authors have demonstrated a functional PnP double heterojunction bipolar transistor (DHBT) using AlGaAs, InGaAsN, and GaAs. The band alignment between InGaAsN and GaAs has a large {triangle}E{sub C} and a negligible {triangle}E{sub V}, and this unique characteristic is very suitable for PnP DHBT applications. The metalorganic vapor phase epitaxy (MOCVD) grown Al{sub 0.3}Ga{sub 0.7}As/In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01}/GaAs PnP DHBT is lattice matched to GaAs and has a peak current gain of 25. Because of the smaller bandgap (Eg = 1.20 eV) of In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01} used for the base layer, this device has a low V{sub ON} of 0.79 V, which is 0.25 V lower than in a comparable Pnp AlGaAs/GaAs HBT. And because GaAs is used for the collector, its BV{sub CEO} is 12 V, consistent with BV{sub CEO} of AlGaAs/GaAs HBTs of comparable collector thickness and doping level.

  2. A G-band terahertz monolithic integrated amplifier in 0.5-μm InP double heterojunction bipolar transistor technology

    NASA Astrophysics Data System (ADS)

    Ou-Peng, Li; Yong, Zhang; Rui-Min, Xu; Wei, Cheng; Yuan, Wang; Bing, Niu; Hai-Yan, Lu

    2016-05-01

    Design and characterization of a G-band (140-220 GHz) terahertz monolithic integrated circuit (TMIC) amplifier in eight-stage common-emitter topology are performed based on the 0.5-μm InGaAs/InP double heterojunction bipolar transistor (DHBT). An inverted microstrip line is implemented to avoid a parasitic mode between the ground plane and the InP substrate. The on-wafer measurement results show that peak gains are 20 dB at 140 GHz and more than 15-dB gain at 140-190 GHz respectively. The saturation output powers are -2.688 dBm at 210 GHz and -2.88 dBm at 220 GHz, respectively. It is the first report on an amplifier operating at the G-band based on 0.5-μm InP DHBT technology. Compared with the hybrid integrated circuit of vacuum electronic devices, the monolithic integrated circuit has the advantage of reliability and consistency. This TMIC demonstrates the feasibility of the 0.5-μm InGaAs/InP DHBT amplifier in G-band frequencies applications. Project supported by the National Natural Science Foundation of China (Grant No. 61501091) and the Fundamental Research Funds for the Central Universities of Ministry of Education of China (Grant Nos. ZYGX2014J003 and ZYGX2013J020).

  3. Epitaxial growth and characterization of thick multi-layer 4H-SiC for very high-voltage insulated gate bipolar transistors

    NASA Astrophysics Data System (ADS)

    Miyazawa, Tetsuya; Nakayama, Koji; Tanaka, Atsushi; Asano, Katsunori; Ji, Shi-yang; Kojima, Kazutoshi; Ishida, Yuuki; Tsuchida, Hidekazu

    2015-08-01

    Techniques to fabricate thick multi-layer 4H-SiC epitaxial wafers were studied for very high-voltage p- and n-channel insulated gate bipolar transistors (IGBTs). Multi-layer epitaxial growth, including a thick p- drift layer (˜180 μm), was performed on a 4H-SiC n+ substrate to form a p-IGBT structure. For an n-IGBT structure, an inverted growth process was employed, in which a thick n- drift layer (˜180 μm) and a thick p++ injector layer (>55 μm) were epitaxially grown. The epitaxial growth conditions were modified to attain a low defect density, a low doping concentration, and a long carrier lifetime in the drift layers. Reduction of the forward voltage drop was attempted by using carrier lifetime enhancement processes, specifically, carbon ion implantation/annealing and thermal oxidation/annealing or hydrogen annealing. Simple PiN diodes were fabricated to demonstrate the effective conductivity modulation in the thick drift layers. The forward voltage drops of the PiN diodes with the p- and n-IGBT structures promise to obtain the extremely low-loss and very high-voltage IGBTs. The change in wafer shape during the processing of the very thick multi-layer 4H-SiC is also discussed.

  4. Vertical Hole Transport and Carrier Localization in InAs /InAs1 -xSbx Type-II Superlattice Heterojunction Bipolar Transistors

    NASA Astrophysics Data System (ADS)

    Olson, B. V.; Klem, J. F.; Kadlec, E. A.; Kim, J. K.; Goldflam, M. D.; Hawkins, S. D.; Tauke-Pedretti, A.; Coon, W. T.; Fortune, T. R.; Shaner, E. A.; Flatté, M. E.

    2017-02-01

    Heterojunction bipolar transistors are used to measure vertical hole transport in narrow-band-gap InAs /InAs1 -xSbx type-II superlattices (T2SLs). Vertical hole mobilities (μh) are reported and found to decrease rapidly from 360 cm2/V s at 120 K to approximately 2 cm2/V s at 30 K, providing evidence that holes are confined to localized states near the T2SL valence-miniband edge at low temperatures. Four distinct transport regimes are identified: (1) pure miniband transport, (2) miniband transport degraded by temporary capture of holes in localized states, (3) hopping transport between localized states in a mobility edge, and (4) hopping transport through defect states near the T2SL valence-miniband edge. Region (2) is found to have a thermal activation energy of ɛ2=36 meV corresponding to the energy range of a mobility edge. Region (3) is found to have a thermal activation energy of ɛ3=16 meV corresponding to the hopping transport activation energy. This description of vertical hole transport is analogous to electronic transport observed in disordered amorphous semiconductors displaying Anderson localization. For the T2SL, we postulate that localized states are created by disorder in the group-V alloy of the InAs1 -xSbx hole well causing fluctuations in the T2SL valence-band energy.

  5. Effect of 100MeV oxygen ion irradiation on silicon NPN power transistor

    NASA Astrophysics Data System (ADS)

    Kumar, M. Vinay; Krishnakumar, K. S.; Dinesh, C. M.; Krishnaveni, S.; Ramani

    2012-06-01

    The radiation response of npn Bipolar junction transistor (BJT) has been examined for 100 MeV O7+ ion. Key electrical properties like Gummel characteristics, dc current gain and capacitance-voltage of 100MeV O7+ ion irradiated transistor were studied before and after irradiation. The device was decapped and the electrical characterizations were performed at room temperature. Base current is observed to be more sensitive than collector current and gain appears to be degraded with ion fluence, also considerable degradation in C-V characteristics is observed and doping concentration is found to be increased along with the increase in ion fluence.

  6. Effect of 100MeV oxygen ion irradiation on silicon NPN power transistor

    SciTech Connect

    Kumar, M. Vinay; Krishnakumar, K. S.; Dinesh, C. M.; Krishnaveni, S.; Ramani

    2012-06-05

    The radiation response of npn Bipolar junction transistor (BJT) has been examined for 100 MeV O{sup 7+} ion. Key electrical properties like Gummel characteristics, dc current gain and capacitance-voltage of 100MeV O{sup 7+} ion irradiated transistor were studied before and after irradiation. The device was decapped and the electrical characterizations were performed at room temperature. Base current is observed to be more sensitive than collector current and gain appears to be degraded with ion fluence, also considerable degradation in C-V characteristics is observed and doping concentration is found to be increased along with the increase in ion fluence.

  7. Evidence of minority carrier injection efficiency >90% in an epitaxial graphene/SiC Schottky emitter bipolar junction phototransistor for ultraviolet detection

    SciTech Connect

    Chava, Venkata S. N. Omar, Sabih U.; Brown, Gabriel; Shetu, Shamaita S.; Andrews, J.; Sudarshan, T. S.; Chandrashekhar, M. V. S.

    2016-01-25

    In this letter, we report the UV detection characteristics of an epitaxial graphene (EG)/SiC based Schottky emitter bipolar phototransistor (SEPT) with EG on top as the transparent Schottky emitter layer. Under 0.43 μW UV illumination, the device showed a maximum common emitter current gain of 113, when operated in the Schottky emitter mode. We argue that avalanche gain and photoconductive gain can be excluded, indicating minority carrier injection efficiency, γ, as high as 99% at the EG/p-SiC Schottky junction. This high γ is attributed to the large, highly asymmetric barrier, which EG forms with the p-SiC. The maximum responsivity of the UV phototransistor is estimated to be 7.1 A/W. The observed decrease in gain with increase in UV power is attributed to recombination in the base region, which reduces the minority carrier lifetime.

  8. Electron quasi-Fermi level splitting at the base emitter junction of HBTs and DHBTs

    NASA Astrophysics Data System (ADS)

    García-Loureiro, Antonio J.; López-González, Juan M.

    2004-03-01

    In this paper we study the amount of electron quasi-Fermi level splitting in the emitter-base junction of single and double heterojunction bipolar transistors using a new numerical model that includes Fermi-Dirac statistics and base recombination current. The degree of splitting is different using our model than with previous models when high voltage or high doping levels are used. In order to illustrate its features, the model is applied to the study of collector current HBTs and DHBTs.

  9. Characterization of Minority Carrier Transport and Heavy Doping Effects in N-SILICON/P-SILICON(1-X) Germanium(x)/n - Heterojunction Bipolar Transistors.

    NASA Astrophysics Data System (ADS)

    Ghani, Tahir

    1995-01-01

    The n-Si/p-Si_{rm 1 -x}Ge_{rm x} /n-Si heterojunction bipolar transistor (HBT) is one of the most promising devices for manufacturing Si -based ultra-fast circuits. The Si_{ rm 1-x}Ge_{rm x} layer is used as the base of the transistor and can be grown by a slight modification of Si technology. The purpose of this work is to experimentally characterize the effects of heavy doping on electron transport in p -type strained Si_{rm 1-x} Ge_{rm x}. The device and process design issues specific to the fabrication of heavily doped n-Si/p^+ -Si_{rm 1-x}Ge _{rm x}n-Si HBTs are outlined. Boron out-diffusion from the p^+ -Si_{rm 1-x}Ge _{rm x} base is significantly enhanced during 850^circC, 10 sec. rapid thermal annealing, following emitter contact implantation. Techniques which dramatically reduce boron out-diffusion during emitter contact implant activation are introduced. HBTs incorporating these techniques were fabricated to characterize the minority carrier transport parameters in p^+-Si_ {rm 1-x}Ge_{ rm x}. A.C. and D.C. measurements were used to independently extract the doping dependence of minority electron diffusivity (D_{ rm n}) and apparent dopant induced bandgap narrowing (DeltaE_ {rm g-app}) for p-type, strained Si_{rm 1-x}Ge _{rm x} layers ( ~10^{17} -10^{20} cm^ {-3}). The results indicate that DeltaE_{rm g-app } in Si_{rm 1-x} Ge_{rm x} is similar to that in Si for dopings <10 ^{19} cm^ {-3} but is smaller in Si_{1-x}Ge_{ rm x} at higher doping concentrations. This is attributed to the lower valence band density of states in Si_{1-x}Ge _{rm x}, which makes the effect of Fermi-Dirac statistics more pronounced. The dopant induced bandgap narrowing values, obtained after correcting for Fermi-Dirac statistics, are in good agreement with theoretical predictions. These results are important for modeling the current characteristics of high performance Si/Si_{rm 1-x}Ge _{rm x} HBTs.

  10. STABILIZED TRANSISTOR AMPLIFIER

    DOEpatents

    Noe, J.B.

    1963-05-01

    A temperature stabilized transistor amplifier having a pair of transistors coupled in cascade relation that are capable of providing amplification through a temperature range of - 100 un. Concent 85% F to 400 un. Concent 85% F described. The stabilization of the amplifier is attained by coupling a feedback signal taken from the emitter of second transistor at a junction between two serially arranged biasing resistances in the circuit of the emitter of the second transistor to the base of the first transistor. Thus, a change in the emitter current of the second transistor is automatically corrected by the feedback adjustment of the base-emitter potential of the first transistor and by a corresponding change in the base-emitter potential of the second transistor. (AEC)

  11. Design and fabrication of a perpendicular magnetic tunnel junction based nonvolatile programmable switch achieving 40% less area using shared-control transistor structure

    PubMed Central

    Suzuki, D.; Natsui, M.; Mochizuki, A.; Miura, S.; Honjo, H.; Kinoshita, K.; Fukami, S.; Sato, H.; Ikeda, S.; Endoh, T.; Ohno, H.; Hanyu, T.

    2014-01-01

    A compact nonvolatile programmable switch (NVPS) using 90 nm CMOS technology together with perpendicular magnetic tunnel junction (p-MTJ) devices is fabricated for zero-standby-power field-programmable gate array. Because routing information does not change once it is programmed into an NVPS, high-speed read and write accesses are not required and a write-control transistor can be shared among all the NVPSs, which greatly simplifies structure of the NVPS. In fact, the effective area of the proposed NVPS is reduced by 40% compared to that of a conventional MTJ-based NVPS. The instant on/off behavior without external nonvolatile memory access is also demonstrated using the fabricated test chip. PMID:24753634

  12. Carbon doping for the GaAs base layer of Heterojunction Bipolar Transistors in a production scale MOVPE reactor

    NASA Astrophysics Data System (ADS)

    Brunner, F.; Bergunde, T.; Richter, E.; Kurpas, P.; Achouche, M.; Maaßdorf, A.; Würfl, J.; Weyers, M.

    2000-12-01

    In this work different approaches for carbon doping of GaAs in MOVPE are compared with respect to their growth- and device-related material properties. Doping levels up to 6×10 19 cm -3 and smooth surface morphologies are achieved with either intrinsically (TMG and AsH 3 or TMAs) or extrinsically (CBr 4) doped layers. Despite comparable structural and majority carrier properties differences in GaInP/GaAs-HBT device performance depending on base doping conditions are obtained. Devices with an intrinsically doped base layer (TMG+AsH 3) show superior transistor performance with a current gain to base sheet resistance ratio ( β/ Rsb) exceeding 0.5 for base thicknesses as large as 120 nm. The use of either CBr 4 or TMAs as base growth precursors results in reduced current gains ( β/ Rsb⩽0.3). It is shown that the achieved HBT current gain is directly related to recombination centers in the heavily doped base layer depending on doping method.

  13. Design, fabrication, and performance analysis of GaN vertical electron transistors with a buried p/n junction

    SciTech Connect

    Yeluri, Ramya Lu, Jing; Keller, Stacia; Mishra, Umesh K.; Hurni, Christophe A.; Browne, David A.; Speck, James S.; Chowdhury, Srabanti

    2015-05-04

    The Current Aperture Vertical Electron Transistor (CAVET) combines the high conductivity of the two dimensional electron gas channel at the AlGaN/GaN heterojunction with better field distribution offered by a vertical design. In this work, CAVETs with buried, conductive p-GaN layers as the current blocking layer are reported. The p-GaN layer was regrown by metalorganic chemical vapor deposition and the subsequent channel regrowth was done by ammonia molecular beam epitaxy to maintain the p-GaN conductivity. Transistors with high ON current (10.9 kA/cm{sup 2}) and low ON-resistance (0.4 mΩ cm{sup 2}) are demonstrated. Non-planar selective area regrowth is identified as the limiting factor to transistor breakdown, using planar and non-planar n/p/n structures. Planar n/p/n structures recorded an estimated electric field of 3.1 MV/cm, while non-planar structures showed a much lower breakdown voltage. Lowering the p-GaN regrowth temperature improved breakdown in the non-planar n/p/n structure. Combining high breakdown voltage with high current will enable GaN vertical transistors with high power densities.

  14. pn-junction delineation in Si devices using scanning capacitance spectroscopy

    NASA Astrophysics Data System (ADS)

    Edwards, Hal; Ukraintsev, Vladimir A.; San Martin, Richard; Johnson, F. Scott; Menz, Philip; Walsh, Shawn; Ashburn, Stan; Wills, K. Scott; Harvey, Ken; Chang, Mi-Chang

    2000-02-01

    The scanning capacitance microscope (SCM) is a carrier-sensitive imaging tool based upon the well-known scanning-probe microscope (SPM). As reported in Edwards et al. [Appl. Phys. Lett. 72, 698 (1998)], scanning capacitance spectroscopy (SCS) is a new data-taking method employing an SCM. SCS produces a two-dimensional map of the electrical pn junctions in a Si device and also provides an estimate of the depletion width. In this article, we report a series of microelectronics applications of SCS in which we image submicron transistors, Si bipolar transistors, and shallow-trench isolation structures. We describe two failure-analysis applications involving submicron transistors and shallow-trench isolation. We show a process-development application in which SCS provides microscopic evidence of the physical origins of the narrow-emitter effect in Si bipolar transistors. We image the depletion width in a Si bipolar transistor to explain an electric field-induced hot-carrier reliability failure. We show two sample geometries that can be used to examine different device properties.

  15. Gallium arsenide-gallium nitride wafer fusion and the n-aluminum gallium arsenide/p-gallium arsenide/n-gallium nitride double heterojunction bipolar transistor

    NASA Astrophysics Data System (ADS)

    Estrada, Sarah M.

    This dissertation describes the n-AlGaAs/p-GaAs/n-GaN heterojunction bipolar transistor (HBT), the first transistor formed via wafer fusion. The fusion process was developed as a way to combine lattice-mismatched materials for high-performance electronic devices, not obtainable via conventional all-epitaxial formation methods. Despite the many challenges of wafer fusion, successful transistors were demonstrated and improved, via the optimization of material structure and fusion process conditions. Thus, this project demonstrated the integration of disparate device materials, chosen for their optimal electronic properties, unrestricted by the conventional (and very limiting) requirement of lattice-matching. By combining an AlGaAs-GaAs emitter-base with a GaN collector, the HBT benefited from the high breakdown voltage of GaN, and from the high emitter injection efficiency and low base transit time of AlGaAs-GaAs. Because the GaAs-GaN lattice mismatch precluded an all-epitaxial formation of the HBT, the GaAs-GaN heterostructure was formed via fusion. This project began with the development of a fusion process that formed mechanically robust and electrically active GaAs-GaN heterojunctions. During the correlation of device electrical performance with a systematic variation of fusion conditions over a wide range (500--750°C, 0.5--2hours), a mid-range fusion temperature was found to induce optimal HBT electrical performance. Transmission electron microscopy (TEM) and secondary ion mass spectrometry (SIMS) were used to assess possible reasons for the variations observed in device electrical performance. Fusion process conditions were correlated with electrical (I-V), structural (TEM), and chemical (SIMS) analyses of the resulting heterojunctions, in order to investigate the trade-off between increased interfacial disorder (TEM) with low fusion temperature and increased diffusion (SIMS) with high fusion temperature. The best do device results (IC ˜ 2.9 kA/cm2 and beta

  16. The Wannier-Stark effects in the 6H-SiC planar junction field-effect transistors with a p-n junction as the gate

    SciTech Connect

    Sankin, V. I. Shkrebii, P. P.; Lebedev, A. A.

    2006-10-15

    Dependence of the short-circuit photocurrent on the voltage V{sub g} applied to the gate of the 6H-SiC planar field-effect transistor is studied. The negative differential photoconductivity appeared at a certain value of V{sub g}; the parameters of this photoconductivity corresponded to those of the Wannier-Stark ladders in the natural 6H-SiC super lattice. At the same value of V{sub g}, a fairly abrupt decrease to zero of the source-drain current I{sub sd} is observed, which is indicative of cutoff at the voltage that is much lower than the expected cutoff voltage for this structure. The effect is attributed to a decrease in mobility in the mode of the Wannier-Stark ladders, a decrease in the rate of ionization of the donor atoms, and a reduction in the screening of the field.

  17. Monitoring the junction temperature of an IGBT through direct measurement using a fiber Bragg grating

    NASA Astrophysics Data System (ADS)

    Bazzo, João P.; Lukasievicz, Tiago; Vogt, Marcio; de Oliveira, Valmir; Kalinowski, Hypolito J.; Cardozo da Silva, Jean Carlos

    2011-05-01

    This paper proposes a new technique to monitor the junction temperature of an insulated gate bipolar transistor (IGBT) through direct measurement using an optical fiber sensor mounted on the chip structure. Some features of the sensor such as electromagnetic immunity, small size and fast response time allow the identification of temperature changes generated by the energy loss during device operation. In addition to the online monitoring of the junction temperature, results show the thermal characteristics of the IGBT, which can be used to develop an accurate model to simulate the heat generated during the device conduction and switching processes.

  18. Interpreting Transistor Noise

    NASA Astrophysics Data System (ADS)

    Pospieszalski, M. W.

    2010-10-01

    The simple noise models of field effect and bipolar transistors reviewed in this article are quite useful in engineering practice, as illustrated by measured and modeled results. The exact and approximate expressions for the noise parameters of FETs and bipolar transistors reveal certain common noise properties and some general noise properties of both devices. The usefulness of these expressions in interpreting the dependence of measured noise parameters on frequency, bias, and temperature and, consequently, in checking of consistency of measured data has been demonstrated.

  19. Broad Beam and Ion Microprobe Studies of Single-Event Upsets in High Speed 0.18micron Silicon Germanium Heterojunction Bipolar Transistors and Circuits

    NASA Technical Reports Server (NTRS)

    Reed, Robert A.; Marshall, Paul W.; Pickel, Jim; Carts, Martin A.; Irwin, TIm; Niu, Guofu; Cressler, John; Krithivasan, Ramkumar; Fritz, Karl; Riggs, Pam

    2003-01-01

    SiGe based technology is widely recognized for its tremendous potential to impact the high speed microelectronic industry, and therefore the space industry, by monolithic incorporation of low power complementary logic with extremely high speed SiGe Heterojunction Bipolar Transistor (HBT) logic. A variety of studies have examined the ionizing dose, displacement damage and single event characteristics, and are reported. Accessibility to SiGe through an increasing number of manufacturers adds to the importance of understanding its intrinsic radiation characteristics, and in particular the single event effect (SEE) characteristics of the high bandwidth HBT based circuits. IBM is now manufacturing in its 3rd generation of their commercial SiGe processes, and access is currently available to the first two generations (known as and 6HP) through the MOSIS shared mask services with anticipated future release of the latest (7HP) process. The 5 HP process is described and is characterized by a emitter spacing of 0.5 micron and a cutoff frequency ff of 50 GHz, whereas the fully scaled 7HP HBT employs a 0.18 micron emitter and has an fT of 120 GHz. Previous investigations have the examined SEE response of 5 HP HBT circuits through both circuit testing and modeling. Charge collection modeling studies in the 5 H P process have also been conducted, but to date no measurements have been reported of charge collection in any SiGe HBT structures. Nor have circuit models for charge collection been developed in any version other than the 5 HP HBT structure. Our investigation reports the first indications of both charge collection and circuit response in IBM s 7HP-based SiGe process. We compare broad beam heavy ion SEU test results in a fully function Pseudo-Random Number (PRN) sequence generator up to frequencies of 12 Gbps versus effective LET, and also report proton test results in the same circuit. In addition, we examine the charge collection characteristics of individual 7HP HBT

  20. Junction-Structure-Dependent Schottky Barrier Inhomogeneity and Device Ideality of Monolayer MoS2 Field-Effect Transistors.

    PubMed

    Moon, Byoung Hee; Han, Gang Hee; Kim, Hyun; Choi, Homin; Bae, Jung Jun; Kim, Jaesu; Jin, Youngjo; Jeong, Hye Yun; Joo, Min-Kyu; Lee, Young Hee; Lim, Seong Chu

    2017-03-29

    Although monolayer transition metal dichalcogenides (TMDs) exhibit superior optical and electrical characteristics, their use in digital switching devices is limited by incomplete understanding of the metal contact. Comparative studies of Au top and edge contacts with monolayer MoS2 reveal a temperature-dependent ideality factor and Schottky barrier height (SBH). The latter originates from inhomogeneities in MoS2 caused by defects, charge puddles, and grain boundaries, which cause local variation in the work function at Au-MoS2 junctions and thus different activation temperatures for thermionic emission. However, the effect of inhomogeneities due to impurities on the SBH varies with the junction structure. The weak Au-MoS2 interaction in the top contact, which yields a higher SBH and ideality factor, is more affected by inhomogeneities than the strong interaction in the edge contact. Observed differences in the SBH and ideality factor in different junction structures clarify how the SBH and inhomogeneities can be controlled in devices containing TMD materials.

  1. Schottky bipolar I-MOS: An I-MOS with Schottky electrodes and an open-base BJT configuration for reduced operating voltage

    NASA Astrophysics Data System (ADS)

    Kannan, N.; Kumar, M. Jagadesh

    2017-04-01

    In this paper, we have proposed a novel impact ionization MOS (I-MOS) structure, called the Schottky bipolar I-MOS, with Schottky source and drain electrodes and utilizing the open-base bipolar junction transistor (BJT) configuration for achieving reduction in the operating voltage of the I-MOS transistor. We report, using 2-D simulations, a low operating voltage (∼1.1 V) and a low subthreshold swing (∼3.6 mV/Decade). For the corresponding p-i-n I-MOS, the operating voltage is ∼5.5 V. The operating voltage of the Schottky bipolar I-MOS is the lowest reported operating voltage for silicon based I-MOS transistors. The nearly 80% reduction in the operating voltage of the Schottky bipolar I-MOS makes it suitable for applications requiring low operating voltages. The Schottky bipolar I-MOS is also expected to have an improved reliability over the p-i-n I-MOS since high energy carriers, induced by impact ionization near the drain, do not have to pass under the gate region in the channel. The use of Schottky contacts instead of heavily doped source and drain regions and the low channel doping level reduces the required thermal budget for device fabrication. The low operating voltage, low subthreshold swing and possibly improved reliability of the Schottky bipolar I-MOS, makes it a potential solution for applications where steep subthreshold slope transistors are being explored as alternative to the conventional MOS transistor.

  2. Integrated ZnO Nano-Electron-Emitter with Self-Modulated Parasitic Tunneling Field Effect Transistor at the Surface of the p-Si/ZnO Junction

    NASA Astrophysics Data System (ADS)

    Cao, Tao; Luo, Laitang; Huang, Yifeng; Ye, Bing; She, Juncong; Deng, Shaozhi; Chen, Jun; Xu, Ningsheng

    2016-09-01

    The development of high performance nano-electron-emitter arrays with well reliability still proves challenging. Here, we report a featured integrated nano-electron-emitter. The vertically aligned nano-emitter consists of two segments. The top segment is an intrinsically lightly n-type doped ZnO nano-tip, while the bottom segment is a heavily p-type doped Si nano-pillar (denoted as p-Si/ZnO nano-emitter). The anode voltage not only extracted the electron emission from the emitter apex but also induced the inter-band electron tunneling at the surface of the p-Si/ZnO nano-junction. The designed p-Si/ZnO emitter is equivalent to a ZnO nano-tip individually ballasted by a p-Si/ZnO diode and a parasitic tunneling field effect transistor (TFET) at the surface of the p-Si/ZnO junction. The parasitic TFET provides a channel for the supply of emitting electron, while the p-Si/ZnO diode is benefit for impeding the current overloading and prevent the emitters from a catastrophic breakdown. Well repeatable and stable field emission current were obtained from the p-Si/ZnO nano-emitters. High performance nano-emitters was developed using diamond-like-carbon coated p-Si/ZnO tip array (500 × 500), i.e., 178 μA (4.48 mA/cm2) at 75.7 MV/m.

  3. Integrated ZnO Nano-Electron-Emitter with Self-Modulated Parasitic Tunneling Field Effect Transistor at the Surface of the p-Si/ZnO Junction

    PubMed Central

    Cao, Tao; Luo, Laitang; Huang, Yifeng; Ye, Bing; She, Juncong; Deng, Shaozhi; Chen, Jun; Xu, Ningsheng

    2016-01-01

    The development of high performance nano-electron-emitter arrays with well reliability still proves challenging. Here, we report a featured integrated nano-electron-emitter. The vertically aligned nano-emitter consists of two segments. The top segment is an intrinsically lightly n-type doped ZnO nano-tip, while the bottom segment is a heavily p-type doped Si nano-pillar (denoted as p-Si/ZnO nano-emitter). The anode voltage not only extracted the electron emission from the emitter apex but also induced the inter-band electron tunneling at the surface of the p-Si/ZnO nano-junction. The designed p-Si/ZnO emitter is equivalent to a ZnO nano-tip individually ballasted by a p-Si/ZnO diode and a parasitic tunneling field effect transistor (TFET) at the surface of the p-Si/ZnO junction. The parasitic TFET provides a channel for the supply of emitting electron, while the p-Si/ZnO diode is benefit for impeding the current overloading and prevent the emitters from a catastrophic breakdown. Well repeatable and stable field emission current were obtained from the p-Si/ZnO nano-emitters. High performance nano-emitters was developed using diamond-like-carbon coated p-Si/ZnO tip array (500 × 500), i.e., 178 μA (4.48 mA/cm2) at 75.7 MV/m. PMID:27654068

  4. Integrated ZnO Nano-Electron-Emitter with Self-Modulated Parasitic Tunneling Field Effect Transistor at the Surface of the p-Si/ZnO Junction.

    PubMed

    Cao, Tao; Luo, Laitang; Huang, Yifeng; Ye, Bing; She, Juncong; Deng, Shaozhi; Chen, Jun; Xu, Ningsheng

    2016-09-22

    The development of high performance nano-electron-emitter arrays with well reliability still proves challenging. Here, we report a featured integrated nano-electron-emitter. The vertically aligned nano-emitter consists of two segments. The top segment is an intrinsically lightly n-type doped ZnO nano-tip, while the bottom segment is a heavily p-type doped Si nano-pillar (denoted as p-Si/ZnO nano-emitter). The anode voltage not only extracted the electron emission from the emitter apex but also induced the inter-band electron tunneling at the surface of the p-Si/ZnO nano-junction. The designed p-Si/ZnO emitter is equivalent to a ZnO nano-tip individually ballasted by a p-Si/ZnO diode and a parasitic tunneling field effect transistor (TFET) at the surface of the p-Si/ZnO junction. The parasitic TFET provides a channel for the supply of emitting electron, while the p-Si/ZnO diode is benefit for impeding the current overloading and prevent the emitters from a catastrophic breakdown. Well repeatable and stable field emission current were obtained from the p-Si/ZnO nano-emitters. High performance nano-emitters was developed using diamond-like-carbon coated p-Si/ZnO tip array (500 × 500), i.e., 178 μA (4.48 mA/cm(2)) at 75.7 MV/m.

  5. pn-Junction Delineation in Si Devices Using Scanning Capacitance Spectroscopy

    NASA Astrophysics Data System (ADS)

    Edwards, Hal

    2000-03-01

    The scanning capacitance microscope (SCM) is a carrier-sensitive imaging tool based upon the well-known scanning-probe microscope (SPM). Scanning capacitance spectroscopy (SCS) is a new way to utilize an SCM to delineate pn junctions in Si devices. SCS produces two-dimensional pn-junction maps that show features as small as 10 nm. SCS also provides an estimate of the pn-junction depletion width and hence the doping level near the pn junction. We report SCS measurements of deep-submicron field-effect transistors, showing the source-drain extender profile. We show SCM and SCS data in a failure-analysis application, in which we determined the cause of a leaky field-effect transistor. SCM and SCS are powerful tools for Si bipolar transistors, in which the doping-related structures are quite complex. We show microscopic evidence of the narrow-emitter effect, and image the width of the pn junction to explain an electric field-induced hot-carrier reliability issue. We show a comparison of top-view and cross-sectional SCS measurements of nwell-nwell shallow-trench isolation structures, to reveal the effects of photoresist scumming in sub-design-rule isolation widths. We show initial results on a method to delineate constant-potential contours within the depletion region. We discuss the limits to our present understanding of SCM and SCS and some potential sources of error.

  6. High Temperature Heterojunction Bipolar Transistors

    DTIC Science & Technology

    1994-04-15

    2700 cmW/V-s at room temperature, a far higher value than ever found for GaN or AlGaN. Thus a GaN/ InGaN HEMT would be analogous to InP/InGaAs HEMTs...Spire’s ECR plasma source modif led as a crystal growth reactor. 8 The substrate for the film deposition is mounted on a sample holder which is...The three samples from the second growth run were also characterized. One sample was found to have a very even frosty white haze on it. The other

  7. Investigation of carbon profiles for enhanced boron confinement and improved carrier transport in strained silicon germanium nanolayers for heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Enicks, Darwin Gene

    This research covers a breadth of topics, in Chapters 1 through 7, ranging from the crystal lattice, to dopant diffusion in SiGe, to SiGe and SiGeC chemical vapor deposition, to the Si/SiGe and Si/SiGeC energy band structure, and NPN SiGeC HBT AC and DC characteristics. Chapters 8 and 9 contain the results of the research, which relates the film growth and carbon positioning to boron diffusion, sheet resistance, and device performance; specifically current gain, fmax, and noise figures of merit. The first objective of the dissertation was to investigate carbon doping profiles in nano-layers (≤32 nm) of silicon germanium (Si1-xGe x), and provide an understanding of "remote carbon boron confinement" (RCBC), which is demonstrated to exploit the advantages of carbon to increase NPN HBT (heterojunction bipolar transistor) performance, reduce base resistance, and improve overall noise figures of merit. The second objective was to investigate the noise characteristics of this method compared to the standard method of placing carbon throughout the lattice, which is known as "uniform carbon boron confinement" (UCBC). The current technological development towards smaller and faster devices has forced engineers and scientists to look into materials other than silicon, but which are highly compatible. A natural choice is the Si1-xGe x alloy, since Ge is also a Group IV. Si1-xGex has the same lattice structure as Si, but its lattice constant is 4.2% larger (aSi = 0.543nm, aGe = 0.567nm), and the bandgap is less than that of Si (Eg_Si = 1.11eV, Eg_Ge = 0.67eV). This opens the possibility of bandgap, strain, and dopant diffusion engineering, all of which affect the material and electronic properties of devices. The primary benefit of carbon is to reduce the diffusion of boron in Si1-xGex thus keeping the base narrow for significantly reduced electron transit times and increased unity gain cutoff frequencies (fT). However the utilization of carbon reduces base conductivity and

  8. Impact of doping and MOCVD conditions on minority carrier lifetime of zinc- and carbon-doped InGaAs and its applications to zinc- and carbon-doped InP/InGaAs heterostructure bipolar transistors

    NASA Astrophysics Data System (ADS)

    Cui, Delong; Hubbard, Seth M.; Pavlidis, Dimitris; Eisenbach, Andreas; Chelli, Cyril

    2002-06-01

    The impact of doping and metalorganic chemical vapour deposition growth conditions on the minority carrier lifetime of zinc- and carbon-doped InGaAs is reported. Room temperature photoluminescence measurements have been employed to obtain direct information on the non-radiative lifetime of the materials. Low growth temperature and low V/III ratio lead to the lower carrier lifetime of the carbon-doped InGaAs samples. InP/InGaAs heterostructure bipolar transistors were grown and fabricated using both zinc- and carbon-doped InGaAs layers as the base regions. The current gain values measured for these devices agree well with the values calculated from the carrier lifetime and mobility/diffusion coefficient measurements.

  9. 20-μm deep trench isolation process characterization for linear bipolar ICs

    NASA Astrophysics Data System (ADS)

    Dyer, Terry; Doohan, Ian J.; Fallon, Martin; McAlpine, Dave; Aitkenhead, Adam; McGinty, Jim; Taylor, M.; Gravelle, Philip; Schouten, A.; Bryce, M.

    2001-04-01

    The use of junction isolation in linear bipolar ICs substantially consumes silicon area. The replacement of junction isolation with trench isolation has the potential to significantly reduce device area while maintaining high voltage operation. Deep trench isolation has been implemented on a conventional non- complementary 40V (NPN BVceo) linear IC process. A fully functional lower power operational amplifier has been fabricated as a technology driver. Device characterization shows that transistor leakage currents (Iceo) and leakage between trench tubs can be made comparable with junction isolated devices. The NPN buried layer can successfully be butted against the trench sidewall without device degradation, although this is currently not possible with the NPN base. An NPN device shrink of 3X has been achieved and further development is underway to increase this towards the 4X level, where the base diffusion front touches the trench sidewall.

  10. Design criteria of low-power low-noise charge amplifiers in VLSI bipolar technology

    SciTech Connect

    Bertuccio, G.; Fasoli, L.; Sampietro, M.

    1997-10-01

    The criteria underlying the design of low-noise front-end integrated electronics for radiation and particle detectors have been determined, taking into account the limits in the allowable power dissipation. The analysis specifically treats integrated amplifiers employing silicon bipolar transistors, whose performance has been studied to highlight the ultimate noise limit and the roles of the front-end device parameters such as the current gain, the base spreading resistance, the junction and diffusion capacitances, the transition frequency, and the device geometry. The relationships existing among the power dissipated in the front-end stage, the noise performance, and the characteristic of signal processing are derived.

  11. Characterization, Modeling and Design Parameters Identification of Silicon Carbide Junction Field Effect Transistor for Temperature Sensor Applications

    PubMed Central

    Salah, Tarek Ben; Khachroumi, Sofiane; Morel, Hervé

    2010-01-01

    Sensor technology is moving towards wide-band-gap semiconductors providing high temperature capable devices. Indeed, the higher thermal conductivity of silicon carbide, (three times more than silicon), permits better heat dissipation and allows better cooling and temperature management. Though many temperature sensors have already been published, little endeavours have been invested in the study of silicon carbide junction field effect devices (SiC-JFET) as a temperature sensor. SiC-JFETs devices are now mature enough and it is close to be commercialized. The use of its specific properties versus temperatures is the major focus of this paper. The SiC-JFETs output current-voltage characteristics are characterized at different temperatures. The saturation current and its on-resistance versus temperature are successfully extracted. It is demonstrated that these parameters are proportional to the absolute temperature. A physics-based model is also presented. Relationships between on-resistance and saturation current versus temperature are introduced. A comparative study between experimental data and simulation results is conducted. Important to note, the proposed model and the experimental results reflect a successful agreement as far as a temperature sensor is concerned. PMID:22315547

  12. Characterization, modeling and design parameters identification of silicon carbide junction field effect transistor for temperature sensor applications.

    PubMed

    Ben Salah, Tarek; Khachroumi, Sofiane; Morel, Hervé

    2010-01-01

    Sensor technology is moving towards wide-band-gap semiconductors providing high temperature capable devices. Indeed, the higher thermal conductivity of silicon carbide, (three times more than silicon), permits better heat dissipation and allows better cooling and temperature management. Though many temperature sensors have already been published, little endeavours have been invested in the study of silicon carbide junction field effect devices (SiC-JFET) as a temperature sensor. SiC-JFETs devices are now mature enough and it is close to be commercialized. The use of its specific properties versus temperatures is the major focus of this paper. The SiC-JFETs output current-voltage characteristics are characterized at different temperatures. The saturation current and its on-resistance versus temperature are successfully extracted. It is demonstrated that these parameters are proportional to the absolute temperature. A physics-based model is also presented. Relationships between on-resistance and saturation current versus temperature are introduced. A comparative study between experimental data and simulation results is conducted. Important to note, the proposed model and the experimental results reflect a successful agreement as far as a temperature sensor is concerned.

  13. Optimization of Vertical Double-Diffused Metal-Oxide Semiconductor (VDMOS) Power Transistor Structure for Use in High Frequencies and Medical Devices

    PubMed Central

    Farhadi, Rozita; Farhadi, Bita

    2014-01-01

    Power transistors, such as the vertical, double-diffused, metal-oxide semiconductor (VDMOS), are used extensively in the amplifier circuits of medical devices. The aim of this research was to construct a VDMOS power transistor with an optimized structure to enhance the operation of medical devices. First, boron was implanted in silicon by implanting unclamped inductive switching (UIS) and a Faraday shield. The Faraday shield was implanted in order to replace the gate-field parasitic capacitor on the entry part of the device. Also, implanting the UIS was used in order to decrease the effect of parasitic bipolar junction transistor (BJT) of the VDMOS power transistor. The research tool used in this study was Silvaco software. By decreasing the transistor entry resistance in the optimized VDMOS structure, power losses and noise at the entry of the transistor were decreased, and, by increasing the breakdown voltage, the lifetime of the VDMOS transistor lifetime was increased, which resulted in increasing drain flow and decreasing Ron. This consequently resulted in enhancing the operation of high-frequency medical devices that use transistors, such as Radio Frequency (RF) and electrocardiograph machines. PMID:25763152

  14. Optimization of Vertical Double-Diffused Metal-Oxide Semiconductor (VDMOS) Power Transistor Structure for Use in High Frequencies and Medical Devices.

    PubMed

    Farhadi, Rozita; Farhadi, Bita

    2014-01-01

    Power transistors, such as the vertical, double-diffused, metal-oxide semiconductor (VDMOS), are used extensively in the amplifier circuits of medical devices. The aim of this research was to construct a VDMOS power transistor with an optimized structure to enhance the operation of medical devices. First, boron was implanted in silicon by implanting unclamped inductive switching (UIS) and a Faraday shield. The Faraday shield was implanted in order to replace the gate-field parasitic capacitor on the entry part of the device. Also, implanting the UIS was used in order to decrease the effect of parasitic bipolar junction transistor (BJT) of the VDMOS power transistor. The research tool used in this study was Silvaco software. By decreasing the transistor entry resistance in the optimized VDMOS structure, power losses and noise at the entry of the transistor were decreased, and, by increasing the breakdown voltage, the lifetime of the VDMOS transistor lifetime was increased, which resulted in increasing drain flow and decreasing Ron. This consequently resulted in enhancing the operation of high-frequency medical devices that use transistors, such as Radio Frequency (RF) and electrocardiograph machines.

  15. Ultra-stable oscillator with complementary transistors

    NASA Technical Reports Server (NTRS)

    Kleinberg, L. L. (Inventor)

    1974-01-01

    A high frequency oscillator, having both good short and long term stability, is formed by including a piezoelectric crystal in the base circuit of a first bi-polar transistor circuit, the bi-polar transistor itself operated below its transitional frequency and having its emitter load chosen so that the input impedance, looking into the base thereof, exhibits a negative resistance in parallel with a capacitive reactance. Combined with this basic circuit is an auxiliary, complementary, second bi-polar transistor circuit of the same form with the piezoelectric crystal being common to both circuits. By this configuration small changes in quiescent current are substantially cancelled by opposite variations in the second bi-polar transistor circuit, thereby achieving from the oscillator a signal having its frequency of oscillation stable over long time periods as well as short time periods.

  16. Bipolar disorder

    MedlinePlus

    Manic depression; Bipolar affective disorder; Mood disorder - bipolar; Manic depressive disorder ... happiness and high activity or energy (mania) or depression and low activity or energy (depression). The following ...

  17. Radiation-induced 1/f noise degradation of bipolar linear voltage regulator

    NASA Astrophysics Data System (ADS)

    Qifeng, Zhao; Yiqi, Zhuang; Junlin, Bao; Wei, Hu

    2016-03-01

    Radiation-induced 1/f noise degradation in the LM117 bipolar linear voltage regulator is studied. Based on the radiation-induced degradation mechanism of the output voltage, it is suggested that the band-gap reference subcircuit is the critical component which leads to the 1/f noise degradation of the LM117. The radiation makes the base surface current of the bipolar junction transistors of the band-gap reference subcircuit increase, which leads to an increase in the output 1/f noise of the LM117. Compared to the output voltage, the 1/f noise parameter is more sensitive, it may be used to evaluate the radiation resistance capability of LM117. Project supported by the National Natural Science Foundation of China (Nos. 61076101, 61204092).

  18. Metamorphosis of the transistor into a laser

    NASA Astrophysics Data System (ADS)

    Feng, M.; Holonyak, N., Jr.

    2015-01-01

    Based on the invention and operation of the transistor, the alloy diode laser, the quantum-well diode laser and the high-speed heterojunction bipolar transistor (HBT), we have invented and realized now a transistor laser (TL). The transistor laser is a three-terminal technology providing coupling and the coherent light emission in the transistor. The quantum-well (QW) heterojunction bipolar transistor laser, inherently a fast switching device, operates by transporting a small minority base charge density ˜1016 \\text{cm}-3 over a nanoscale base thickness (<900 \\text{A}) in picoseconds. The TL, owing to its fast recombination speed, its unique three-terminal configuration, and complementary nature of its optical and electrical collector output signals, enables resonance-free base current and collector voltage modulation. It is a compact source of electro-optical applications such as nonlinear signal mixing, frequency multiplication, negative feedback, and optoelectronics logic gates.

  19. Bipolar Disorder.

    PubMed

    Miller, Thomas H

    2016-06-01

    Bipolar disorder is a chronic mental health disorder that is frequently encountered in primary care. Many patients with depression may actually have bipolar disorder. The management of bipolar disorder requires proper diagnosis and awareness or referral for appropriate pharmacologic therapy. Patients with bipolar disorder require primary care management for comorbidities such as cardiovascular and metabolic disorders.

  20. AlGaAs/GaAs/InGaAs pnp-type vertical-cavity surface-emitting transistor-lasers.

    PubMed

    Xiang, Y; Reuterskiöld-Hedlund, C; Yu, X; Yang, C; Zabel, T; Hammar, M; Akram, M N

    2015-06-15

    We report on the design, fabrication and analysis of vertical-cavity surface-emitting transistor-lasers (T-VCSELs) based on the homogeneous integration of an InGaAs/GaAs VCSEL and an AlGaAs/GaAs pnp-heterojunction bipolar transistor (HBT). Epitaxial regrowth confinement, modulation doping, intracavity contacting and non-conducting mirrors are used to ensure a low-loss structure, and a variety of design variations are investigated for a proper internal biasing and current injection to ensure a wide operating range. Optimized devices show mW-range output power, mA-range base threshold current and high-temperature operation to at least 60°C with the transistor in its active mode of operation for base currents well beyond threshold. Current confinement schemes based on pnp-blocking layers or a buried tunnel junction are investigated as well as asymmetric current injection for reduced extrinsic resistances.

  1. Quantum Thermal Transistor.

    PubMed

    Joulain, Karl; Drevillon, Jérémie; Ezzahri, Younès; Ordonez-Miranda, Jose

    2016-05-20

    We demonstrate that a thermal transistor can be made up with a quantum system of three interacting subsystems, coupled to a thermal reservoir each. This thermal transistor is analogous to an electronic bipolar one with the ability to control the thermal currents at the collector and at the emitter with the imposed thermal current at the base. This is achieved by determining the heat fluxes by means of the strong-coupling formalism. For the case of three interacting spins, in which one of them is coupled to the other two, that are not directly coupled, it is shown that high amplification can be obtained in a wide range of energy parameters and temperatures. The proposed quantum transistor could, in principle, be used to develop devices such as a thermal modulator and a thermal amplifier in nanosystems.

  2. Quantum Thermal Transistor

    NASA Astrophysics Data System (ADS)

    Joulain, Karl; Drevillon, Jérémie; Ezzahri, Younès; Ordonez-Miranda, Jose

    2016-05-01

    We demonstrate that a thermal transistor can be made up with a quantum system of three interacting subsystems, coupled to a thermal reservoir each. This thermal transistor is analogous to an electronic bipolar one with the ability to control the thermal currents at the collector and at the emitter with the imposed thermal current at the base. This is achieved by determining the heat fluxes by means of the strong-coupling formalism. For the case of three interacting spins, in which one of them is coupled to the other two, that are not directly coupled, it is shown that high amplification can be obtained in a wide range of energy parameters and temperatures. The proposed quantum transistor could, in principle, be used to develop devices such as a thermal modulator and a thermal amplifier in nanosystems.

  3. Bipolar Transistor and Diode Failure to Electrical Transients-Predictive Failure Modeling versus Experimental Damage Testing. 1 Junction Capacitance Damage Model

    DTIC Science & Technology

    1981-06-01

    MCCLELLAN AFB, CA 95652 OFFICER-IN-CHARGE ARLINGTON, VA 22217 CIVIL ENGINEERING LABORATORY SANSO/IN A7TN CODE LOSA (LIBRARY) DIRECTOR AIR FORCE SYSTEMS...COMNAND ATTN CODE LOSA STRATEGIC SYSTEMS PROJECT OFFICE P.O. BOX 92960 4 NAVAL CONSTRUCTION BATTALION CENTER NAVY DEPARTMENT ATTN IND PORT HUENCIE, CA

  4. John Bardeen and transistor physics

    NASA Astrophysics Data System (ADS)

    Huff, Howard R.

    2001-01-01

    John Bardeen and Walter Brattain invented the point-contact semiconductor amplifier (transistor action) in polycrystalline germanium (also observed in polycrystalline silicon) on Dec. 15, 1947, for which they received a patent on Oct. 3, 1950. Bill Shockley was not a co-patent holder on Bardeen and Brattain's point-contact semiconductor amplifier patent since Julius Lilienfeld had already received a patent in 1930 for what would have been Shockley's contribution; namely, the field-effect methodology. Shockley received patents for both his minority-carrier injection concept and junction transistor theory, however, and deservedly shared the Nobel prize with Bardeen and Brattain for his seminal contributions of injection, p-n junction theory and junction transistor theory. We will review the events leading up to the invention of Bardeen and Brattain's point-contact semiconductor amplifier during the magic month of November 17-December 16, 1947 and the invention of Shockley's junction semiconductor amplifier during his magic month of December 24, 1947-January 23, 1948. It was during the course of Bardeen and Brattain's research in November, 1947 that Bardeen also patented the essence of the MOS transistor, wherein the induced minority carriers were confined to the inversion layer enroute to the collector. C. T. Sah has described this device as a sourceless MOS transistor. Indeed, John Bardeen, co-inventor of the point-contact semiconductor amplifier and inventor of the MOS transistor, may rightly be called the father of modern electronics.

  5. Bipolar Disorder

    MedlinePlus

    Bipolar disorder Overview By Mayo Clinic Staff Bipolar disorder, formerly called manic depression, is a mental health condition that causes extreme mood swings that include emotional highs (mania or hypomania) and lows ( ...

  6. Bipolar Disorder

    MedlinePlus

    Bipolar disorder is a serious mental illness. People who have it go through unusual mood changes. They go ... The down feeling is depression. The causes of bipolar disorder aren't always clear. It runs in families. ...

  7. Effect of 50 MeV Li 3+ ion irradiation on electrical characteristics of high speed NPN power transistor

    NASA Astrophysics Data System (ADS)

    Dinesh, C. M.; Ramani; Radhakrishna, M. C.; Dutt, R. N.; Khan, S. A.; Kanjilal, D.

    2008-04-01

    Silicon NPN overlay RF power high speed commercial bipolar junction transistors (BJTs) find applications in military, space and communication equipments. Here we report the effect of 50 MeV Li3+ ion irradiation in the fluence range 1 × 1011-1.8 × 1012 ions cm-2 on NPN power transistor. The range (R), electronic energy loss (Se), nuclear energy loss (Sn), total ionizing dose (TID) and total displacement damage (Dd) in the silicon target are calculated from TRIM Monte Carlo Code. Output resistance is 3.568 × 104 Ω for unirradiated device and it increases to 6 × 107 Ω as the fluence is increased from 1 × 1011 to 1.8 × 1012 ions cm-2. The capacitance of the emitter-base junction of the transistor decreases and dielectric loss of the emitter-base junction increases with increase in ion fluence. The built in voltage of the unirradiated sample is 0.5 V and it shifts to 0.4 V after irradiation at fluence of 1.8 × 1012 ions cm-2 and the corresponding doping density reduced to 5.758 × 1016 cm-3. The charge carrier removal rate varies linearly with the increase in ion fluence.

  8. Simulating Single-Event Upsets in Bipolar RAM's

    NASA Technical Reports Server (NTRS)

    Zoutendyk, J. A.

    1986-01-01

    Simulation technique saves testing. Uses interactive version of SPICE (Simulation Program with Integrated Circuit Emphasis). Device and subcircuit models available in software used to construct macromodel for an integrated bipolar transistor. Time-dependent current generators placed inside transistor macromodel to simulate charge collection from ion track. Significant finding of experiments is standard design practice of reducing power in unaddressed bipolar RAM cell increases sensitivity of cell to single-event upsets.

  9. A review of InP/InAlAs/InGaAs based transistors for high frequency applications

    NASA Astrophysics Data System (ADS)

    Ajayan, J.; Nirmal, D.

    2015-10-01

    This paper presents an overview of the rapid progress being made in the development of InP based devices for high speed applications. Over the past few decades, major aero space industries have been developing InP based hetero structure devices like hetero junction bipolar transistors (HBTs) and high electron mobility transistors (HEMT) because of their low DC power due to excellent low voltage operation and milli-meter wave frequency performance even though its widespread use has been limited by high cost. InP based HBTs, MOSFETs and HEMTs have also been developed by commercial companies for applications in high speed fiber optic communications because InP based device technologies takes advantage of the intrinsic material properties such as high thermal conductivity, high electron mobility and low energy band gap for low voltage operation compared to silicon, silicon-germenium, and GaAs based semiconductor devices.

  10. Junctionless Cooper pair transistor

    NASA Astrophysics Data System (ADS)

    Arutyunov, K. Yu.; Lehtinen, J. S.

    2017-02-01

    Quantum phase slip (QPS) is the topological singularity of the complex order parameter of a quasi-one-dimensional superconductor: momentary zeroing of the modulus and simultaneous 'slip' of the phase by ±2π. The QPS event(s) are the dynamic equivalent of tunneling through a conventional Josephson junction containing static in space and time weak link(s). Here we demonstrate the operation of a superconducting single electron transistor (Cooper pair transistor) without any tunnel junctions. Instead a pair of thin superconducting titanium wires in QPS regime was used. The current-voltage characteristics demonstrate the clear Coulomb blockade with magnitude of the Coulomb gap modulated by the gate potential. The Coulomb blockade disappears above the critical temperature, and at low temperatures can be suppressed by strong magnetic field.

  11. Low Power Band to Band Tunnel Transistors

    DTIC Science & Technology

    2010-12-15

    the E-field and tunneling at the source- pocket junction you form a parasitic NPN + transistor and the injection mechanism of carriers into the...hypothesis that the 1000 ° C, 5s anneal split lead to a very wide pocket and the accidental formation of a NPN + transistor , while the 1000 ° C, 1s anneal...Low Power Band to Band Tunnel Transistors Anupama Bowonder Electrical Engineering and Computer Sciences University of California at Berkeley

  12. Design considerations for FET-gated power transistors

    NASA Technical Reports Server (NTRS)

    Chen, D. Y.; Chin, S. A.

    1983-01-01

    An FET-bipolar combinational power transistor configuration (tested up to 300 V, 20 A at 100 kHz) is described. The critical parameters for integrating the chips in hybrid form are examined, and an effort to optimize the overall characteristics of the configuration is discussed. Chip considerations are examined with respect to the voltage and current rating of individual chips, the FET surge capability, the choice of triple diffused transistor or epitaxial transistor for the bipolar element, the current tailing effect, and the implementation of the bipolar transistor and an FET as single chip or separate chips. Package considerations are discussed with respect to package material and geometry, surge current capability of bipolar base terminal bonding, and power losses distribution.

  13. Bipolar Disorder.

    ERIC Educational Resources Information Center

    Spearing, Melissa

    Bipolar disorder, a brain disorder that causes unusual shifts in a person's mood, affects approximately one percent of the population. It commonly occurs in late adolescence and is often unrecognized. The diagnosis of bipolar disorder is made on the basis of symptoms, course of illness, and when possible, family history. Thoughts of suicide are…

  14. Chirality effect in disordered graphene ribbon junctions

    NASA Astrophysics Data System (ADS)

    Long, Wen

    2012-05-01

    We investigate the influence of edge chirality on the electronic transport in clean or disordered graphene ribbon junctions. By using the tight-binding model and the Landauer-Büttiker formalism, the junction conductance is obtained. In the clean sample, the zero-magnetic-field junction conductance is strongly chirality-dependent in both unipolar and bipolar ribbons, whereas the high-magnetic-field conductance is either chirality-independent in the unipolar or chirality-dependent in the bipolar ribbon. Furthermore, we study the disordered sample in the presence of magnetic field and find that the junction conductance is always chirality-insensitive for both unipolar and bipolar ribbons with adequate disorders. In addition, the disorder-induced conductance plateaus can exist in all chiral bipolar ribbons provided the disorder strength is moderate. These results suggest that we can neglect the effect of edge chirality in fabricating electronic devices based on the magnetotransport in a disordered graphene ribbon.

  15. Method for double-sided processing of thin film transistors

    DOEpatents

    Yuan, Hao-Chih; Wang, Guogong; Eriksson, Mark A.; Evans, Paul G.; Lagally, Max G.; Ma, Zhenqiang

    2008-04-08

    This invention provides methods for fabricating thin film electronic devices with both front- and backside processing capabilities. Using these methods, high temperature processing steps may be carried out during both frontside and backside processing. The methods are well-suited for fabricating back-gate and double-gate field effect transistors, double-sided bipolar transistors and 3D integrated circuits.

  16. Electronic Model of a Ferroelectric Field Effect Transistor

    NASA Technical Reports Server (NTRS)

    MacLeod, Todd C.; Ho, Fat Duen; Russell, Larry (Technical Monitor)

    2001-01-01

    A pair of electronic models has been developed of a Ferroelectric Field Effect transistor. These models can be used in standard electrical circuit simulation programs to simulate the main characteristics of the FFET. The models use the Schmitt trigger circuit as a basis for their design. One model uses bipolar junction transistors and one uses MOSFET's. Each model has the main characteristics of the FFET, which are the current hysterisis with different gate voltages and decay of the drain current when the gate voltage is off. The drain current from each model has similar values to an actual FFET that was measured experimentally. T'he input and o Output resistance in the models are also similar to that of the FFET. The models are valid for all frequencies below RF levels. No attempt was made to model the high frequency characteristics of the FFET. Each model can be used to design circuits using FFET's with standard electrical simulation packages. These circuits can be used in designing non-volatile memory circuits and logic circuits and is compatible with all SPICE based circuit analysis programs. The models consist of only standard electrical components, such as BJT's, MOSFET's, diodes, resistors, and capacitors. Each model is compared to the experimental data measured from an actual FFET.

  17. Degradation mechanisms of current gain in NPN transistors

    NASA Astrophysics Data System (ADS)

    Li, Xing-Ji; Geng, Hong-Bin; Lan, Mu-Jie; Yang, De-Zhuang; He, Shi-Yu; Liu, Chao-Ming

    2010-06-01

    An investigation of ionization and displacement damage in silicon NPN bipolar junction transistors (BJTs) is presented. The transistors were irradiated separately with 90-keV electrons, 3-MeV protons and 40-MeV Br ions. Key parameters were measured in-situ and the change in current gain of the NPN BJTS was obtained at a fixed collector current (Ic = 1 mA). To characterise the radiation damage of NPN BJTs, the ionizing dose Di and displacement dose Dd as functions of chip depth in the NPN BJTs were calculated using the SRIM and Geant4 code for protons, electrons and Br ions, respectively. Based on the discussion of the radiation damage equation for current gain, it is clear that the current gain degradation of the NPN BJTs is sensitive to both ionization and displacement damage. The degradation mechanism of the current gain is related to the ratio of Dd/(Dd + Di) in the sensitive region given by charged particles. The irradiation particles leading to lower Dd/(Dd + Di) within the same chip depth at a given total dose would mainly produce ionization damage to the NPN BJTs. On the other hand, the charged particles causing larger Dd/(Dd + Di) at a given total dose would tend to generate displacement damage to the NPN BJTs. The Messenger-Spratt equation could be used to describe the experimental data for the latter case.

  18. Bipolar Treatment: Are Bipolar I and Bipolar II Treated Differently?

    MedlinePlus

    ... Daniel K. Hall-Flavin, M.D. Treatment for bipolar disorder, formerly called manic depression, generally involves medications and ... bipolar I disorder. In addition to medication for bipolar disorder, other treatment approaches include: Psychotherapy. As a key ...

  19. All-optical transistor- and diode-action and logic gates based on anisotropic nonlinear responsive liquid crystal.

    PubMed

    Wang, Cheng-Yu; Chen, Chun-Wei; Jau, Hung-Chang; Li, Cheng-Chang; Cheng, Chiao-Yu; Wang, Chun-Ta; Leng, Shi-Ee; Khoo, Iam-Choon; Lin, Tsung-Hsien

    2016-08-05

    In this paper, we show that anisotropic photosensitive nematic liquid crystals (PNLC) made by incorporating anisotropic absorbing dyes are promising candidates for constructing all-optical elements by virtue of the extraordinarily large optical nonlinearity of the nematic host. In particular, we have demonstrated several room-temperature 'prototype' PNLC-based all-optical devices such as optical diode, optical transistor and all primary logic gate operations (OR, AND, NOT) based on such optical transistor. Owing to the anisotropic absorption property and the optical activity of the twist alignment nematic cell, spatially non-reciprocal transmission response can be obtained within a sizeable optical isolation region of ~210 mW. Exploiting the same mechanisms, a tri-terminal configuration as an all-optical analogue of a bipolar junction transistor is fabricated. Its ability to be switched by an optical field enables us to realize an all-optical transistor and demonstrate cascadability, signal fan-out, logic restoration, and various logical gate operations such as OR, AND and NOT. Due to the possibility of synthesizing anisotropic dyes and wide ranging choice of liquid crystals nonlinear optical mechanisms, these all-optical operations can be optimized to have much lower thresholds and faster response speeds. The demonstrated capabilities of these devices have shown great potential in all-optical control system and photonic integrated circuits.

  20. All-optical transistor- and diode-action and logic gates based on anisotropic nonlinear responsive liquid crystal

    PubMed Central

    Wang, Cheng-Yu; Chen, Chun-Wei; Jau, Hung-Chang; Li, Cheng-Chang; Cheng, Chiao-Yu; Wang, Chun-Ta; Leng, Shi-Ee; Khoo, Iam-Choon; Lin, Tsung-Hsien

    2016-01-01

    In this paper, we show that anisotropic photosensitive nematic liquid crystals (PNLC) made by incorporating anisotropic absorbing dyes are promising candidates for constructing all-optical elements by virtue of the extraordinarily large optical nonlinearity of the nematic host. In particular, we have demonstrated several room-temperature ‘prototype’ PNLC-based all-optical devices such as optical diode, optical transistor and all primary logic gate operations (OR, AND, NOT) based on such optical transistor. Owing to the anisotropic absorption property and the optical activity of the twist alignment nematic cell, spatially non-reciprocal transmission response can be obtained within a sizeable optical isolation region of ~210 mW. Exploiting the same mechanisms, a tri-terminal configuration as an all-optical analogue of a bipolar junction transistor is fabricated. Its ability to be switched by an optical field enables us to realize an all-optical transistor and demonstrate cascadability, signal fan-out, logic restoration, and various logical gate operations such as OR, AND and NOT. Due to the possibility of synthesizing anisotropic dyes and wide ranging choice of liquid crystals nonlinear optical mechanisms, these all-optical operations can be optimized to have much lower thresholds and faster response speeds. The demonstrated capabilities of these devices have shown great potential in all-optical control system and photonic integrated circuits. PMID:27491391

  1. All-optical transistor- and diode-action and logic gates based on anisotropic nonlinear responsive liquid crystal

    NASA Astrophysics Data System (ADS)

    Wang, Cheng-Yu; Chen, Chun-Wei; Jau, Hung-Chang; Li, Cheng-Chang; Cheng, Chiao-Yu; Wang, Chun-Ta; Leng, Shi-Ee; Khoo, Iam-Choon; Lin, Tsung-Hsien

    2016-08-01

    In this paper, we show that anisotropic photosensitive nematic liquid crystals (PNLC) made by incorporating anisotropic absorbing dyes are promising candidates for constructing all-optical elements by virtue of the extraordinarily large optical nonlinearity of the nematic host. In particular, we have demonstrated several room-temperature ‘prototype’ PNLC-based all-optical devices such as optical diode, optical transistor and all primary logic gate operations (OR, AND, NOT) based on such optical transistor. Owing to the anisotropic absorption property and the optical activity of the twist alignment nematic cell, spatially non-reciprocal transmission response can be obtained within a sizeable optical isolation region of ~210 mW. Exploiting the same mechanisms, a tri-terminal configuration as an all-optical analogue of a bipolar junction transistor is fabricated. Its ability to be switched by an optical field enables us to realize an all-optical transistor and demonstrate cascadability, signal fan-out, logic restoration, and various logical gate operations such as OR, AND and NOT. Due to the possibility of synthesizing anisotropic dyes and wide ranging choice of liquid crystals nonlinear optical mechanisms, these all-optical operations can be optimized to have much lower thresholds and faster response speeds. The demonstrated capabilities of these devices have shown great potential in all-optical control system and photonic integrated circuits.

  2. Bipolar battery

    DOEpatents

    Kaun, Thomas D.

    1992-01-01

    A bipolar battery having a plurality of cells. The bipolar battery includes: a negative electrode; a positive electrode and a separator element disposed between the negative electrode and the positive electrode, the separator element electrically insulating the electrodes from one another; an electrolyte disposed within at least one of the negative electrode, the positive electrode and the separator element; and an electrode containment structure including a cup-like electrode holder.

  3. Modeling of single-event upset in bipolar integrated circuits

    NASA Technical Reports Server (NTRS)

    Zoutendyk, J. A.

    1983-01-01

    The results of work done on the quantitative characterization of single-event upset (SEU) in bipolar random-access memories (RAMs) have been obtained through computer simulation of SEU in RAM cells that contain circuit models for bipolar transistors. The models include current generators that emulate the charge collected from ion tracks. The computer simulation results are compared with test data obtained from a RAM in a bipolar microprocessor chip. This methodology is applicable to other bipolar integrated circuit constructions in addition to RAM cells.

  4. Bipolar Disorder (For Teens)

    MedlinePlus

    ... Loss Surgery? A Week of Healthy Breakfasts Shyness Bipolar Disorder KidsHealth > For Teens > Bipolar Disorder A A A ... Bipolar Disorder en español Trastorno bipolar What Is Bipolar Disorder? Bipolar disorders are one of several medical conditions ...

  5. Bipolar disorder

    PubMed Central

    Goodwin, Frederick K.; Ghaemi, S. Nassir

    1999-01-01

    Bipolar disorder's unique combination of three characteristics - clear genetic diathesis, distinctive clinical features, early availability of an effective treatment (lithium) - explains its special place in the history of psychiatry and its contribution to the current explosive growth of neuroscience. This article looks at the state of the art in bipolar disorder from the vantage point of: (i) genetics (possible linkages on chromosomes 18 and 21q, polygenic hypothesis, research into genetic markers); (ii) diagnosis (new focus on the subjective aspects of bipolar disorder to offset the current trend of underdiagnosis due to overreliance on standardized interviews and rating scales); (iii) outcome (increase in treatment-resistant forms signaling a change in the natural history of bipolar disorder); (iv) pathophysiology (research into circadian biological rhythms and the kindling hypothesis to explain recurrence); (v) treatment (emergence of the anticonvulsants, suggested role of chronic antidepressant treatment in the development of treatment resistance); (vi) neurobiology (evaluation of regulatory function in relation to affective disturbances, role of postsynaptic second-messenger mechanisms, advances in functional neuroimaging); and (vii) psychosocial research (shedding overly dualistic theories of the past to understand the mind and brain as an entity, thus emphasizing the importance of balancing the psychopharmacological and psychotherapeutic approaches). Future progress in the understanding and treatment of bipolar disorder will rely on successful integration of the biological and psychosocial lines of investigation. PMID:22033232

  6. Fabrication of self-aligned graded junction termination extensions with applications to 4H-SiC P-N diodes

    NASA Astrophysics Data System (ADS)

    Merrett, J. N.; Isaacs-Smith, T.; Sheridan, D. C.; Williams, J. R.

    2002-06-01

    The properties of SiC make this wide band-gap semiconductor a promising material for high power devices. This potential is demonstrated in various devices, such as p-n diodes, Schottky diodes, bipolar junction transistors, thyristors, etc., all of which require adequate and affordable termination techniques to reduce leakage current and increase breakdown voltage in order to maximize power-handling capabilities. In this paper, we describe a technique for fabricating a graded junction termination extension (GJTE) that is effective and self-aligned, a feature that simplifies the implantation process during fabrication and, therefore, has the potential to reduce production costs. Implanted anode p-n diodes fabricated using this technique on 10-µm thick n- epitaxial layer had a maximum breakdown voltage of 1830 V. This was comparable to the ideal parallel-plane breakdown of 1900 V predicted by numerical simulation.

  7. Junctionless nanowire TFET with built-in N-P-N bipolar action: Physics and operational principle

    NASA Astrophysics Data System (ADS)

    Rahimian, Morteza; Fathipour, Morteza

    2016-12-01

    In this paper, we present a novel junctionless nanowire tunneling FET (JN-TFET) in which the source region is divided into an n+ as well as a p+ type region. We will show that this structure can provide a built-in n-p-n bipolar junction transistor (BJT) action in the on state of the device. In this regime, tunneling of electrons from the source valence band into the channel conduction band enhances the hole concentration in the p+ source region. Also, the potential in this region is increased, which drives a built-in BJT transistor by forward biasing the base-emitter junction. Thus, the BJT current adds up to the normal tunneling current in the JN-TFET. Owing to the sharp switching of the JN-TFET and the high BJT current gain, the overall performance of the device, herein called "BJN-TFET," is improved. On-state currents as high as 2.17 × 10-6 A/μm and subthreshold swings as low as ˜50 mV/dec at VDS = 1 V are achieved.

  8. An improved trench gate super-junction IGBT with double emitter

    NASA Astrophysics Data System (ADS)

    Weinan, Dai; Jing, Zhu; Weifeng, Sun; Yicheng, Du; Keqin, Huang

    2015-01-01

    An improved trench gate super-junction insulated-gate bipolar transistor is presented. The improved structure contains two emitter regions. The first emitter region of the device works as the conventional structure, which can absorb both the electron current and hole current. The second emitter on the top of the p-pillar acts as the hole current diverter, leading to an improved latch-up capability without sacrificing the off-state breakdown voltage (BV) and turn-off loss. The simulation shows that the latch-up limit of the SJ-IGBT increases from 15000 to 28300 A/cm2 at VGE = 10 V, the BV is 810 V, and the turn off loss is 6.5 mJ/cm2 at Von = 1.2 V.

  9. Analysis of long-channel nanotube field-effect-transistors (NT FETs)

    NASA Technical Reports Server (NTRS)

    Toshishige, Yamada; Kwak, Dochan (Technical Monitor)

    2001-01-01

    This viewgraph presentation provides an analysis of long-channel nanotube (NT) field effect transistors (FET) from NASA's Ames Research Center. The structure of such a transistor including the electrode contact, 1D junction, and the planar junction is outlined. Also mentioned are various characteristics of a nanotube tip-equipped scanning tunnel microscope (STM).

  10. Graphene transistors.

    PubMed

    Schwierz, Frank

    2010-07-01

    Graphene has changed from being the exclusive domain of condensed-matter physicists to being explored by those in the electron-device community. In particular, graphene-based transistors have developed rapidly and are now considered an option for post-silicon electronics. However, many details about the potential performance of graphene transistors in real applications remain unclear. Here I review the properties of graphene that are relevant to electron devices, discuss the trade-offs among these properties and examine their effects on the performance of graphene transistors in both logic and radiofrequency applications. I conclude that the excellent mobility of graphene may not, as is often assumed, be its most compelling feature from a device perspective. Rather, it may be the possibility of making devices with channels that are extremely thin that will allow graphene field-effect transistors to be scaled to shorter channel lengths and higher speeds without encountering the adverse short-channel effects that restrict the performance of existing devices. Outstanding challenges for graphene transistors include opening a sizeable and well-defined bandgap in graphene, making large-area graphene transistors that operate in the current-saturation regime and fabricating graphene nanoribbons with well-defined widths and clean edges.

  11. Transistor Effect in Improperly Connected Transistors.

    ERIC Educational Resources Information Center

    Luzader, Stephen; Sanchez-Velasco, Eduardo

    1996-01-01

    Discusses the differences between the standard representation and a realistic representation of a transistor. Presents an experiment that helps clarify the explanation of the transistor effect and shows why transistors should be connected properly. (JRH)

  12. What is Bipolar Disorder?

    MedlinePlus

    ... affect friends and family? For More Information Share Bipolar Disorder Download PDF Download ePub Order a free hardcopy ... brochure will give you more information. What is bipolar disorder? Bipolar disorder is a serious brain illness. It ...

  13. Genetics Home Reference: bipolar disorder

    MedlinePlus

    ... Me Understand Genetics Home Health Conditions bipolar disorder bipolar disorder Enable Javascript to view the expand/collapse boxes. ... bipolar affective psychosis bipolar spectrum disorder depression, bipolar manic depressive illness Related Information How are genetic conditions and genes ...

  14. A simplified boron diffusion for preparing the silicon single crystal p-n junction as an educational device

    NASA Astrophysics Data System (ADS)

    Shiota, Koki; Kai, Kazuho; Nagaoka, Shiro; Tsuji, Takuto; Wakahara, Akihiro; Rusop, Mohamad

    2016-07-01

    The educational method which is including designing, making, and evaluating actual semiconductor devices with learning the theory is one of the best way to obtain the fundamental understanding of the device physics and to cultivate the ability to make unique ideas using the knowledge in the semiconductor device. In this paper, the simplified Boron thermal diffusion process using Sol-Gel material under normal air environment was proposed based on simple hypothesis and the feasibility of the reproducibility and reliability were investigated to simplify the diffusion process for making the educational devices, such as p-n junction, bipolar and pMOS devices. As the result, this method was successfully achieved making p+ region on the surface of the n-type silicon substrates with good reproducibility. And good rectification property of the p-n junctions was obtained successfully. This result indicates that there is a possibility to apply on the process making pMOS or bipolar transistors. It suggests that there is a variety of the possibility of the applications in the educational field to foster an imagination of new devices.

  15. Total Dose Effects on Bipolar Integrated Circuits at Low Temperature

    NASA Technical Reports Server (NTRS)

    Johnston, A. H.; Swimm, R. T.; Thorbourn, D. O.

    2012-01-01

    Total dose damage in bipolar integrated circuits is investigated at low temperature, along with the temperature dependence of the electrical parameters of internal transistors. Bandgap narrowing causes the gain of npn transistors to decrease far more at low temperature compared to pnp transistors, due to the large difference in emitter doping concentration. When irradiations are done at temperatures of -140 deg C, no damage occurs until devices are warmed to temperatures above -50 deg C. After warm-up, subsequent cooling shows that damage is then present at low temperature. This can be explained by the very strong temperature dependence of dispersive transport in the continuous-time-random-walk model for hole transport. For linear integrated circuits, low temperature operation is affected by the strong temperature dependence of npn transistors along with the higher sensitivity of lateral and substrate pnp transistors to radiation damage.

  16. Graphene-porphyrin single-molecule transistors.

    PubMed

    Mol, Jan A; Lau, Chit Siong; Lewis, Wilfred J M; Sadeghi, Hatef; Roche, Cecile; Cnossen, Arjen; Warner, Jamie H; Lambert, Colin J; Anderson, Harry L; Briggs, G Andrew D

    2015-08-21

    We demonstrate a robust graphene-molecule-graphene transistor architecture. We observe remarkably reproducible single electron charging, which we attribute to insensitivity of the molecular junction to the atomic configuration of the graphene electrodes. The stability of the graphene electrodes allow for high-bias transport spectroscopy and the observation of multiple redox states at room-temperature.

  17. Ionization damage in NPN transistors caused by lower energy electrons

    NASA Astrophysics Data System (ADS)

    Li, Xingji; Xiao, Jingdong; Liu, Chaoming; Zhao, Zhiming; Geng, Hongbin; Lan, Mujie; Yang, Dezhuang; He, Shiyu

    2010-09-01

    Electrical degradation of two type NPN bipolar junction transistors (BJTs) with different emitter sizes was examined under exposures of 70 and 110 keV electrons. Base and collector currents as a function of base-emitter voltage were in-situ measured during exposure. Experimental results show that both the 70 and 110 keV electrons produce an evident ionization damage to the NPN BJTs. With increasing fluence, collector currents of the NPN BJTs hardly change in the whole range of base-emitter voltage from 0 to 1.2 V, while base currents increase in a gradually mitigative trend. Base currents vary more at lower base-emitter voltages than at higher ones for a given fluence. The change in the reciprocal of current gain at a fixed base-emitter voltage of 0.65 V increases non-linearly at lower fluences and tends to be gradually saturated at higher fluences. Sensitivity to ionization damage increases for BJTs with an emitter having a larger perimeter-to-area ratio.

  18. Comparison of the degradation effects of heavy ion, electron, and cobalt-60 irradiation in an advanced bipolar process

    NASA Technical Reports Server (NTRS)

    Zoutendyk, John A.; Goben, Charles A.; Berndt, Dale F.

    1988-01-01

    Experimental measurements are reported of the degradation effects of high-energy particles (heavy Br ions and electrons) and Co-60 gamma-rays on the current gain of minimum-geometry bipolar transistors made from an advanced process. The data clearly illustrate the total-ionizing-dose vs particle-fluence behavior of this bipolar transistor produced by an advanced process. In particular, bulk damage from Co-60 gamma rays in bipolar transistors (base transport factor degradation) and surface damage in bipolar transistors from ionizing radiation (emitter-efficiency degradation) have been observed. The true equivalence between various types of radiation for this process technology has been determined on the basis of damage from the log K1 intercepts.

  19. High-Frequency Transistors and High-Frequency ICs: Technologies and Applications (BRIEFING CHARTS)

    DTIC Science & Technology

    2007-03-06

    160 Gb/s wireless, mm-wave sensor networks monolithic arrays for radar & communications mm--wave MIMO III-V CMOS for Si VLSI III-V channel MOSFETs...nm CMOS vast #s of near-THz transistors what NEW mm-wave applications will this enable ? massive monolithic mm-wave arrays → 1 Gb/s over ~1...km mm-wave MIMO mm-wave imagingsensor networks Let’s look at InP and CMOS prospects & applications... InP Bipolar Transistors InP Bipolar Transistors

  20. A Heteroepitaxial Perovskite Metal-Base Transistor

    SciTech Connect

    Yajima, T.; Hikita, Y.; Hwang, H.Y.; /Tokyo U. /JST, PRESTO /SLAC

    2011-08-11

    'More than Moore' captures a concept for overcoming limitations in silicon electronics by incorporating new functionalities in the constituent materials. Perovskite oxides are candidates because of their vast array of physical properties in a common structure. They also enable new electronic devices based on strongly-correlated electrons. The field effect transistor and its derivatives have been the principal oxide devices investigated thus far, but another option is available in a different geometry: if the current is perpendicular to the interface, the strong internal electric fields generated at back-to-back heterojunctions can be used for oxide electronics, analogous to bipolar transistors. Here we demonstrate a perovskite heteroepitaxial metal-base transistor operating at room temperature, enabled by interface dipole engineering. Analysis of many devices quantifies the evolution from hot-electron to permeable-base behaviour. This device provides a platform for incorporating the exotic ground states of perovskite oxides, as well as novel electronic phases at their interfaces.

  1. A heteroepitaxial perovskite metal-base transistor.

    PubMed

    Yajima, Takeaki; Hikita, Yasuyuki; Hwang, Harold Y

    2011-03-01

    'More than Moore' captures a concept for overcoming limitations in silicon electronics by incorporating new functionalities in the constituent materials. Perovskite oxides are candidates because of their vast array of physical properties in a common structure. They also enable new electronic devices based on strongly-correlated electrons. The field effect transistor and its derivatives have been the principal oxide devices investigated thus far, but another option is available in a different geometry: if the current is perpendicular to the interface, the strong internal electric fields generated at back-to-back heterojunctions can be used for oxide electronics, analogous to bipolar transistors. Here we demonstrate a perovskite heteroepitaxial metal-base transistor operating at room temperature, enabled by interface dipole engineering. Analysis of many devices quantifies the evolution from hot-electron to permeable-base behaviour. This device provides a platform for incorporating the exotic ground states of perovskite oxides, as well as novel electronic phases at their interfaces.

  2. Nanotube junctions

    DOEpatents

    Crespi, Vincent Henry; Cohen, Marvin Lou; Louie, Steven Gwon Sheng; Zettl, Alexander Karlwalter

    2003-01-01

    The present invention comprises a new nanoscale metal-semiconductor, semiconductor-semiconductor, or metal-metal junction, designed by introducing topological or chemical defects in the atomic structure of the nanotube. Nanotubes comprising adjacent sections having differing electrical properties are described. These nanotubes can be constructed from combinations of carbon, boron, nitrogen and other elements. The nanotube can be designed having different indices on either side of a junction point in a continuous tube so that the electrical properties on either side of the junction vary in a useful fashion. For example, the inventive nanotube may be electrically conducting on one side of a junction and semiconducting on the other side. An example of a semiconductor-metal junction is a Schottky barrier. Alternatively, the nanotube may exhibit different semiconductor properties on either side of the junction. Nanotubes containing heterojunctions, Schottky barriers, and metal-metal junctions are useful for microcircuitry.

  3. Nanotube junctions

    DOEpatents

    Crespi, Vincent Henry; Cohen, Marvin Lou; Louie, Steven Gwon; Zettl, Alexander Karlwalte

    2004-12-28

    The present invention comprises a new nanoscale metal-semiconductor, semiconductor-semiconductor, or metal-metal junction, designed by introducing topological or chemical defects in the atomic structure of the nanotube. Nanotubes comprising adjacent sections having differing electrical properties are described. These nanotubes can be constructed from combinations of carbon, boron, nitrogen and other elements. The nanotube can be designed having different indices on either side of a junction point in a continuous tube so that the electrical properties on either side of the junction vary in a useful fashion. For example, the inventive nanotube may be electrically conducting on one side of a junction and semiconducting on the other side. An example of a semiconductor-metal junction is a Schottky barrier. Alternatively, the nanotube may exhibit different semiconductor properties on either side of the junction. Nanotubes containing heterojunctions, Schottky barriers, and metal-metal junctions are useful for microcircuitry.

  4. High current transistor pulse generator

    SciTech Connect

    Nesterov, V.; Cassel, R.

    1991-05-01

    A solid state pulse generator capable of delivering high current trapezoidally shaped pulses into an inductive load has been developed at SLAC. Energy stored in the capacitor bank of the pulse generator is switched to the load through a pair of Darlington transistors. A combination of diodes and Darlington transistors is used to obtain trapezoidal or triangular shaped current pulses into an inductive load and to recover the remaining energy in the same capacitor bank without reversing capacitor voltage. The transistors work in the switch mode, and the power losses are low. The rack mounted pulse generators presently used at SLAC contain a 660 microfarad storage capacitor bank and can deliver 400 amps at 800 volts into inductive loads up to 3 mH. The pulse generators are used in several different power systems, including pulse to pulse bipolar power supplies and in application with current pulses distributed into different inductive loads. The current amplitude and discharge time are controlled by the central computer system through a specially developed multichannel controller. Several years of operation with the pulse generators have proven their consistent performance and reliability. 8 figs.

  5. Parasitic bipolar effect in ultra-thin FD SOI MOSFETs

    NASA Astrophysics Data System (ADS)

    Liu, F. Y.; Ionica, I.; Bawedin, M.; Cristoloveanu, S.

    2015-10-01

    The parasitic bipolar effect is investigated in fully-depleted silicon-on-insulator (FD SOI) n-type MOSFETs with ultra-thin films (5-10 nm). Our measurements show that at low drain bias the drain leakage current is governed by the gate current. Beyond VD > 1.0 V, leakage current amplification is observed in short-channel 10-nm thick devices. With film thickness shrinking, the current amplification is suppressed. We explain this amplification by the turn-on of the lateral parasitic bipolar transistor. TCAD simulations confirm that the parasitic bipolar is activated due to holes generated by band-to-band tunneling at the drain side and accumulated in the floating body. An effective method for the extraction of bipolar gain is proposed based on the comparison of leakage current in short- and long-channel devices. The experimental method is validated through simulations.

  6. Synergistic effect of mixed neutron and gamma irradiation in bipolar operational amplifier OP07

    NASA Astrophysics Data System (ADS)

    Yan, Liu; Wei, Chen; Shanchao, Yang; Xiaoming, Jin; Chaohui, He

    2016-09-01

    This paper presents the synergistic effects in bipolar operational amplifier OP07. The radiation effects are studied by neutron beam, gamma ray, and mixed neutron/gamma ray environments. The characterateristics of the synergistic effects are studied through comparison of different experiment results. The results show that the bipolar operational amplifier OP07 exhibited significant synergistic effects in the mixed neutron and gamma irradiation. The bipolar transistor is identified as the most radiation sensitive unit of the operational amplifier. In this paper, a series of simulations are performed on bipolar transistors in different radiation environments. In the theoretical simulation, the geometric model and calculations based on the Medici toolkit are built to study the radiation effects in bipolar components. The effect of mixed neutron and gamma irradiation is simulated based on the understanding of the underlying mechanisms of radiation effects in bipolar transistors. The simulated results agree well with the experimental data. The results of the experiments and simulation indicate that the radiation effects in the bipolar devices subjected to mixed neutron and gamma environments is not a simple combination of total ionizing dose (TID) effects and displacement damage. The data suggests that the TID effect could enhance the displacement damage. The synergistic effect should not be neglected in complex radiation environments.

  7. Contact Metallization and Packaging Technology Development for SiC Bipolar Junction Transistors, PiN Diodes, and Schottky Diodes Designed for Long-Term Operations at 350degreeC

    DTIC Science & Technology

    2006-05-01

    Table 3-10. Polyimide breakdown test results Figure 3-1. Illustration of a power module. Figure 3-2. Au-Sn phase diagram [ref. 3.1...Illustration of a power module. The copper foil may be attached to the ceramic by the reaction of CuO and Al2O3 to for AlCu2O4 at high...to less than 10 wt% and raising the alloy melting point to over 400°C. The Au-Sn phase diagram is presented in Figure3-2. Au-Sn eutectic alloys

  8. Identify bipolar spectrum disorders.

    PubMed

    Mynatt, Sarah; Cunningham, Patricia; Manning, J Sloan

    2002-06-01

    Patients with bipolar spectrum disorders commonly present with depressive symptoms to primary care clinicians. This article details bipolar spectrum disorder assessment, treatment, and treatment response. By intervening early in the course of depressive and hypomanic episodes, you can help decrease the morbidity and suffering associated with bipolar spectrum disorders.

  9. Modeling of current gain compression in common emitter mode of a transistor laser above threshold base current

    NASA Astrophysics Data System (ADS)

    Basu, Rikmantra; Mukhopadhyay, Bratati; Basu, P. K.

    2012-04-01

    We have obtained the expressions for the terminal currents in a heterojunction bipolar transistor laser the base of which contains a quantum well (QW). The emitter-base junction is assumed to be abrupt, leading to abrupt discontinuity in quasi-Fermi level at the interface. The expressions for the terminal currents as a function of collector-emitter and base-emitter voltages are obtained from the solution of the continuity equation. The current density in the QW located at an arbitrary position in the base is related to the virtual state current density. The threshold current density in the QW is calculated by using the expression for gain obtained from Fermi golden rule. The plot of collector current (IC) versus collector-emitter voltage (VCE) for different values of base current shows the usual transistor characteristics, i.e., a rising portion after a cut-in VCE, and then a saturation behavior. The dc current gain remains constant. However, as the base current exceeds the threshold, a stimulated recombination rate is added to the spontaneous recombination rate and the plots of collector currents become closer for the same increase in base current. This current gain compression is in agreement with the experimental observation. Our calculated values qualitatively agree with other experimental findings; however some features like Early effect do not show up in the calculation.

  10. Experimental synchronization of chaos in a large ring of mutually coupled single-transistor oscillators: phase, amplitude, and clustering effects.

    PubMed

    Minati, Ludovico

    2014-12-01

    In this paper, experimental evidence of multiple synchronization phenomena in a large (n = 30) ring of chaotic oscillators is presented. Each node consists of an elementary circuit, generating spikes of irregular amplitude and comprising one bipolar junction transistor, one capacitor, two inductors, and one biasing resistor. The nodes are mutually coupled to their neighbours via additional variable resistors. As coupling resistance is decreased, phase synchronization followed by complete synchronization is observed, and onset of synchronization is associated with partial synchronization, i.e., emergence of communities (clusters). While component tolerances affect community structure, the general synchronization properties are maintained across three prototypes and in numerical simulations. The clusters are destroyed by adding long distance connections with distant notes, but are otherwise relatively stable with respect to structural connectivity changes. The study provides evidence that several fundamental synchronization phenomena can be reliably observed in a network of elementary single-transistor oscillators, demonstrating their generative potential and opening way to potential applications of this undemanding setup in experimental modelling of the relationship between network structure, synchronization, and dynamical properties.

  11. Experimental synchronization of chaos in a large ring of mutually coupled single-transistor oscillators: Phase, amplitude, and clustering effects

    SciTech Connect

    Minati, Ludovico E-mail: ludovico.minati@unitn.it

    2014-12-01

    In this paper, experimental evidence of multiple synchronization phenomena in a large (n = 30) ring of chaotic oscillators is presented. Each node consists of an elementary circuit, generating spikes of irregular amplitude and comprising one bipolar junction transistor, one capacitor, two inductors, and one biasing resistor. The nodes are mutually coupled to their neighbours via additional variable resistors. As coupling resistance is decreased, phase synchronization followed by complete synchronization is observed, and onset of synchronization is associated with partial synchronization, i.e., emergence of communities (clusters). While component tolerances affect community structure, the general synchronization properties are maintained across three prototypes and in numerical simulations. The clusters are destroyed by adding long distance connections with distant notes, but are otherwise relatively stable with respect to structural connectivity changes. The study provides evidence that several fundamental synchronization phenomena can be reliably observed in a network of elementary single-transistor oscillators, demonstrating their generative potential and opening way to potential applications of this undemanding setup in experimental modelling of the relationship between network structure, synchronization, and dynamical properties.

  12. Josephson junction

    DOEpatents

    Wendt, J.R.; Plut, T.A.; Martens, J.S.

    1995-05-02

    A novel method for fabricating nanometer geometry electronic devices is described. Such Josephson junctions can be accurately and reproducibly manufactured employing photolithographic and direct write electron beam lithography techniques in combination with aqueous etchants. In particular, a method is described for manufacturing planar Josephson junctions from high temperature superconducting material. 10 figs.

  13. Josephson junction

    DOEpatents

    Wendt, Joel R.; Plut, Thomas A.; Martens, Jon S.

    1995-01-01

    A novel method for fabricating nanometer geometry electronic devices is described. Such Josephson junctions can be accurately and reproducibly manufactured employing photolithographic and direct write electron beam lithography techniques in combination with aqueous etchants. In particular, a method is described for manufacturing planar Josephson junctions from high temperature superconducting material.

  14. Nutrition and Bipolar Depression.

    PubMed

    Beyer, John L; Payne, Martha E

    2016-03-01

    As with physical conditions, bipolar disorder is likely to be impacted by diet and nutrition. Patients with bipolar disorder have been noted to have relatively unhealthy diets, which may in part be the reason they also have an elevated risk of metabolic syndrome and obesity. An improvement in the quality of the diet should improve a bipolar patient's overall health risk profile, but it may also improve their psychiatric outcomes. New insights into biological dysfunctions that may be present in bipolar disorder have presented new theoretic frameworks for understanding the relationship between diet and bipolar disorder.

  15. Gap junctions.

    PubMed

    Goodenough, Daniel A; Paul, David L

    2009-07-01

    Gap junctions are aggregates of intercellular channels that permit direct cell-cell transfer of ions and small molecules. Initially described as low-resistance ion pathways joining excitable cells (nerve and muscle), gap junctions are found joining virtually all cells in solid tissues. Their long evolutionary history has permitted adaptation of gap-junctional intercellular communication to a variety of functions, with multiple regulatory mechanisms. Gap-junctional channels are composed of hexamers of medium-sized families of integral proteins: connexins in chordates and innexins in precordates. The functions of gap junctions have been explored by studying mutations in flies, worms, and humans, and targeted gene disruption in mice. These studies have revealed a wide diversity of function in tissue and organ biology.

  16. Gap Junctions

    PubMed Central

    Goodenough, Daniel A.; Paul, David L.

    2009-01-01

    Gap junctions are aggregates of intercellular channels that permit direct cell–cell transfer of ions and small molecules. Initially described as low-resistance ion pathways joining excitable cells (nerve and muscle), gap junctions are found joining virtually all cells in solid tissues. Their long evolutionary history has permitted adaptation of gap-junctional intercellular communication to a variety of functions, with multiple regulatory mechanisms. Gap-junctional channels are composed of hexamers of medium-sized families of integral proteins: connexins in chordates and innexins in precordates. The functions of gap junctions have been explored by studying mutations in flies, worms, and humans, and targeted gene disruption in mice. These studies have revealed a wide diversity of function in tissue and organ biology. PMID:20066080

  17. Gap Junctions

    PubMed Central

    Nielsen, Morten Schak; Axelsen, Lene Nygaard; Sorgen, Paul L.; Verma, Vandana; Delmar, Mario; Holstein-Rathlou, Niels-Henrik

    2013-01-01

    Gap junctions are essential to the function of multicellular animals, which require a high degree of coordination between cells. In vertebrates, gap junctions comprise connexins and currently 21 connexins are known in humans. The functions of gap junctions are highly diverse and include exchange of metabolites and electrical signals between cells, as well as functions, which are apparently unrelated to intercellular communication. Given the diversity of gap junction physiology, regulation of gap junction activity is complex. The structure of the various connexins is known to some extent; and structural rearrangements and intramolecular interactions are important for regulation of channel function. Intercellular coupling is further regulated by the number and activity of channels present in gap junctional plaques. The number of connexins in cell-cell channels is regulated by controlling transcription, translation, trafficking, and degradation; and all of these processes are under strict control. Once in the membrane, channel activity is determined by the conductive properties of the connexin involved, which can be regulated by voltage and chemical gating, as well as a large number of posttranslational modifications. The aim of the present article is to review our current knowledge on the structure, regulation, function, and pharmacology of gap junctions. This will be supported by examples of how different connexins and their regulation act in concert to achieve appropriate physiological control, and how disturbances of connexin function can lead to disease. © 2012 American Physiological Society. Compr Physiol 2:1981-2035, 2012. PMID:23723031

  18. Memory and negative-resistance effects in a strained metal-gate high-k n-type field-effect-transistor from 375 K down to 77 K

    NASA Astrophysics Data System (ADS)

    Gutiérrez-D, E. A.; Vega-G, V. H.; García-R, P. J.; Huerta-G, O. V.

    2016-12-01

    We introduce an experimental alternative way of looking into the charging and discharging mechanism inside a high-k stacked oxide of a metal-gate strained n-type Field-Effect-Transistor (nFET). This alternative way reproduces a memory and negative resistance effect by biasing the nFET device in a non-conventional way. This is achieved by forward-biasing the drain-bulk junction and by setting the gate electrode in a high-impedance mode. The produced negative resistance effect (NRE) has a controllable peak-to-valley current ratio (PVCR) that goes from about 3.0 up to a value of 5.5 at room temperature. The PVCR increases up to 8.35 at T = 225 K and reduces to 2.84 at T = 375 K in a linear trend. The memory effect is observed when the drain-bulk junction voltage is swept from low to high values and back from high to low values. From low to high forward drain-bulk bias the NRE shows up and vanishes when coming back from high to low forward drain-bulk bias. The NRE and memory effects are attributed to a coupled-gate oxide charging/discharging mechanism with an induced bipolar transistor action in the channel of the FET.

  19. Experimental determination of single-event upset (SEU) as a function of collected charge in bipolar integrated circuits

    NASA Technical Reports Server (NTRS)

    Zoutendyk, J. A.; Malone, C. J.; Smith, L. S.

    1984-01-01

    Single-Event Upset (SEU) in bipolar integrated circuits (ICs) is caused by charge collection from ion tracks in various regions of a bipolar transistor. This paper presents experimental data which have been obtained wherein the range-energy characteristics of heavy ions (Br) have been utilized to determine the cross section for soft-error generation as a function of charge collected from single-particle tracks which penetrate a bipolar static RAM. The results of this work provide a basis for the experimental verification of circuit-simulation SEU modeling in bipolar ICs.

  20. Outlook and emerging semiconducting materials for ambipolar transistors.

    PubMed

    Bisri, Satria Zulkarnaen; Piliego, Claudia; Gao, Jia; Loi, Maria Antonietta

    2014-02-26

    Ambipolar or bipolar transistors are transistors in which both holes and electrons are mobile inside the conducting channel. This device allows switching among several states: the hole-dominated on-state, the off-state, and the electron-dominated on-state. In the past year, it has attracted great interest in exotic semiconductors, such as organic semiconductors, nanostructured materials, and carbon nanotubes. The ability to utilize both holes and electrons inside one device opens new possibilities for the development of more compact complementary metal-oxide semiconductor (CMOS) circuits, and new kinds of optoelectronic device, namely, ambipolar light-emitting transistors. This progress report highlights the recent progresses in the field of ambipolar transistors, both from the fundamental physics and application viewpoints. Attention is devoted to the challenges that should be faced for the realization of ambipolar transistors with different material systems, beginning with the understanding of the importance of interface modification, which heavily affects injections and trapping of both holes and electrons. The recent development of advanced gating applications, including ionic liquid gating, that open up more possibility to realize ambipolar transport in materials in which one type of charge carrier is highly dominant is highlighted. Between the possible applications of ambipolar field-effect transistors, we focus on ambipolar light-emitting transistors. We put this new device in the framework of its prospective for general lightings, embedded displays, current-driven laser, as well as for photonics-electronics interconnection.

  1. Study of bipolar batteries

    NASA Astrophysics Data System (ADS)

    Clifford, J. E.

    1984-06-01

    The status of development of bipolar batteries with an aqueous electrolyte was determined. Included in the study were lead-acid, nickel-cadmium, nickel-zinc, nickel-iron, and nickel-hydrogen batteries. The technical and patent literature is reviewed and a bibliography covering the past 15 years is presented. Literature data are supplemented by a survey of organizations. The principal interest was in bipolar lead-acid batteries and more recently in bipolar nickel-hydrogen batteries for space applications.

  2. High-performance silicon nanowire bipolar phototransistors

    NASA Astrophysics Data System (ADS)

    Tan, Siew Li; Zhao, Xingyan; Chen, Kaixiang; Crozier, Kenneth B.; Dan, Yaping

    2016-07-01

    Silicon nanowires (SiNWs) have emerged as sensitive absorbing materials for photodetection at wavelengths ranging from ultraviolet (UV) to the near infrared. Most of the reports on SiNW photodetectors are based on photoconductor, photodiode, or field-effect transistor device structures. These SiNW devices each have their own advantages and trade-offs in optical gain, response time, operating voltage, and dark current noise. Here, we report on the experimental realization of single SiNW bipolar phototransistors on silicon-on-insulator substrates. Our SiNW devices are based on bipolar transistor structures with an optically injected base region and are fabricated using CMOS-compatible processes. The experimentally measured optoelectronic characteristics of the SiNW phototransistors are in good agreement with simulation results. The SiNW phototransistors exhibit significantly enhanced response to UV and visible light, compared with typical Si p-i-n photodiodes. The near infrared responsivities of the SiNW phototransistors are comparable to those of Si avalanche photodiodes but are achieved at much lower operating voltages. Compared with other reported SiNW photodetectors as well as conventional bulk Si photodiodes and phototransistors, the SiNW phototransistors in this work demonstrate the combined advantages of high gain, high photoresponse, low dark current, and low operating voltage.

  3. High-Gain AlxGa1-xAs/GaAs Transistors For Neural Networks

    NASA Technical Reports Server (NTRS)

    Kim, Jae-Hoon; Lin, Steven H.

    1991-01-01

    High-gain AlxGa1-xAs/GaAs npn double heterojunction bipolar transistors developed for use as phototransistors in optoelectronic integrated circuits, especially in artificial neural networks. Transistors perform both photodetection and saturating-amplification functions of neurons. Good candidates for such application because structurally compatible with laser diodes and light-emitting diodes, detect light, and provide high current gain needed to compensate for losses in holographic optical elements.

  4. A transistors-based, bidirectional flowmeter for neonatal ventilation: design and experimental characterization.

    PubMed

    Giorgino, M; Morbidoni, G; Tamilia, E; Taffoni, F; Formica, D; Schena, E

    2014-01-01

    A bidirectional, low cost flowmeter for neonatal artificial ventilation, suitable for application in mono-patient breathing circuits, is described here. The sensing element consists of two nominally identical bipolar junction transistors employed as hot bodies. The sensor working principle is based on the convective heat transfer between the transistors, heated by Joule phenomenon, and the colder hitting fluid which represents the measurand. The proposed design allows the sensor to discriminate flow direction. Static calibration has been carried out in a range of flowrate values (from -8 L·min(-1) up to +8 L L·min(-1)) covering the ones employed in neonatal ventilation, at different pipe diameters (ie., 10 mm and 30 mm) and collector currents (i.e., 500 mA, 300 mA, and 100 mA) in order to assess the influence of these two parameters on sensor's response. Results show that the configuration with a pipe diameter of 10 mm at the highest collector current guarantees the highest sensitivity (i.e., 763 mV/Lmin1 at low flowrate ± 1 L-min(-1)) and ensures the minimum dead space (2 mL vs 18 mL for 30 mm of diameter). On the other hand, the 30 mm pipe diameter allows extending the range of measurement (up to ±6 L-min 1 vs ±3.5 L· min(-1) at 10 mm), and improving both the discrimination threshold (<;0.1 L·min-(1)) and the symmetry of response. These characteristics together with the low dead space and low cost foster its application to neonatal ventilation.

  5. A transistor based air flow transducer for thermohygrometric control of neonatal ventilatory applications.

    PubMed

    Schena, Emiliano; Silvestri, Sergio

    2008-10-01

    An air flow transducer for controlling heated humidifiers used in neonatal artificial ventilation, suitable for in-line application in monopatient breathing circuits, is described here. The sensor is built with two nominally identical bipolar junction transistors, with different packages, as hot elements operated at a regulated constant voltage. The operation principle is based on the differential convective heat power exchanged with the fluid stream due to the different thermal conductivities of the transistors' packages. The underlying theory is described in mathematical terms and the theoretical model is validated with experimental data in the mass flow rate range from 4 to 215 mg s(-1). The nonlinear behavior allows sensitivities from -5 mV/(mg s(-1)) at flow rates in the range of 4-130 mg s(-1) to -2 mV/(mg s(-1)) at higher flow rates up to 215 mg s(-1). The linear range extends from 40 to 130 mg s(-1), with constant sensitivity equal to -5 mV/(mg s(-1)). The differential nature of the output allows to obtain repeatabilities in the order of 2% for fluid temperatures between 20 and 25 degrees C and of about 6% if the fluid temperature lies in the range of 15-35 degrees C. The relatively long time constant, in the order of 20+/-5 s, makes the sensor suitable for average flow rate measurements. Using the sensor's output as a control variable of a heated humidifier for artificial ventilation, the relative humidity of gases varies by only 20% in the flow rate range of the sensor (from 95% to 75%), whereas the same parameter shows a variation of about 40% (from 100% to 60%) with the same humidifier without flow control.

  6. The photodetected function of silicon photoelectronic lambda negative resistance transistor (PLBT)

    NASA Astrophysics Data System (ADS)

    Zhang, Shi-lin; Zhang, Bo; Guo, Wei-lian; Mao, Lu-hong; Zhang, Pei-ning

    2005-01-01

    In this paper, the photo-detected and controlled functions based on silicon photo-electronic Lambda transistor (PLBT) are reported. PLBT is composed of a npn vertical bipolar transistor as main device and a enhancement-mode MOSFET transistor as feedback device which connected in parallel across the base and collector terminals of bipolar transistor. Photo-electronic-lambda bipolar transistor (PLBT) is one important member of Si-photo electronic negative resistance devices. It has wide applications in photo-electronic coupler, light detector, light sensor and other photo-electronic circuit modules, which is significant for the further study of photo-electronic devices and circuits. When the Si-photo-electronic negative transistor device works as a load, it has two stable output states (bistability characteristics) with the change of the input light signals. Using the photo-bistable and self-locking characteristics of the PLBT, a photo-controlled Bistable Logic Circuit Element has been set up successfully. Through detail studying and analyzing to the operation feature and load feature of the photo-controlled bistable circuit, the nonlinear characteristic of the circuit is demonstrated. Furthermore the applications of this circuit element have been studied and verified.

  7. Chaotic operation by a single transistor circuit in the reverse active region

    NASA Astrophysics Data System (ADS)

    Hanias, M. P.; Giannis, I. L.; Tombras, G. S.

    2010-03-01

    In this paper, we present an externally triggered experimental chaotic circuit with a bipolar junction transistor operating in its reverse active region in order to investigate for possible control features in its output phase portraits. Nonlinear time series modeling techniques are applied to analyze the circuit's output voltage oscillations and reveal the presence of chaos, while the chaos itself is achieved by controlling the amplitude of the applied input signal. The phase space, which describes the behavior evolution of a nonlinear system, is reconstructed using the delay embedding theorem suggested by Takens. The time delay used for this reconstruction is chosen after examining the first minimum of the collected data average mutual information, while the sufficient embedding dimension is estimated using the false nearest-neighbor algorithm which has a value of 5. Also the largest Lyapunov exponent is estimated and found equal to 0.020 48. Finally, the phase space embedding based weight predictor algorithm is employed to make a short-term prediction of the chaotic time series for which the system's governing equations may be unknown.

  8. A neuron-astrocyte transistor-like model for neuromorphic dressed neurons.

    PubMed

    Valenza, G; Pioggia, G; Armato, A; Ferro, M; Scilingo, E P; De Rossi, D

    2011-09-01

    Experimental evidences on the role of the synaptic glia as an active partner together with the bold synapse in neuronal signaling and dynamics of neural tissue strongly suggest to investigate on a more realistic neuron-glia model for better understanding human brain processing. Among the glial cells, the astrocytes play a crucial role in the tripartite synapsis, i.e. the dressed neuron. A well-known two-way astrocyte-neuron interaction can be found in the literature, completely revising the purely supportive role for the glia. The aim of this study is to provide a computationally efficient model for neuron-glia interaction. The neuron-glia interactions were simulated by implementing the Li-Rinzel model for an astrocyte and the Izhikevich model for a neuron. Assuming the dressed neuron dynamics similar to the nonlinear input-output characteristics of a bipolar junction transistor, we derived our computationally efficient model. This model may represent the fundamental computational unit for the development of real-time artificial neuron-glia networks opening new perspectives in pattern recognition systems and in brain neurophysiology.

  9. Chaotic operation by a single transistor circuit in the reverse active region.

    PubMed

    Hanias, M P; Giannis, I L; Tombras, G S

    2010-03-01

    In this paper, we present an externally triggered experimental chaotic circuit with a bipolar junction transistor operating in its reverse active region in order to investigate for possible control features in its output phase portraits. Nonlinear time series modeling techniques are applied to analyze the circuit's output voltage oscillations and reveal the presence of chaos, while the chaos itself is achieved by controlling the amplitude of the applied input signal. The phase space, which describes the behavior evolution of a nonlinear system, is reconstructed using the delay embedding theorem suggested by Takens. The time delay used for this reconstruction is chosen after examining the first minimum of the collected data average mutual information, while the sufficient embedding dimension is estimated using the false nearest-neighbor algorithm which has a value of 5. Also the largest Lyapunov exponent is estimated and found equal to 0.020 48. Finally, the phase space embedding based weight predictor algorithm is employed to make a short-term prediction of the chaotic time series for which the system's governing equations may be unknown.

  10. Types of Bipolar Disorder

    MedlinePlus

    ... problems, or perform poorly in school or at work. Family, friends and people experiencing symptoms may not recognize these problems as signs of a major mental illness such as bipolar disorder. Risk Factors Scientists are studying the possible causes of bipolar disorder. Most agree ...

  11. Semiconductor Lasers Containing Quantum Wells in Junctions

    NASA Technical Reports Server (NTRS)

    Yang, Rui Q.; Qiu, Yueming

    2004-01-01

    In a recent improvement upon In(x)Ga(1-x)As/InP semiconductor lasers of the bipolar cascade type, quantum wells are added to Esaki tunnel junctions, which are standard parts of such lasers. The energy depths and the geometric locations and thicknesses of the wells are tailored to exploit quantum tunneling such that, as described below, electrical resistances of junctions and concentrations of dopants can be reduced while laser performances can be improved. In(x)Ga(1-x)As/InP bipolar cascade lasers have been investigated as sources of near-infrared radiation (specifically, at wavelengths of about 980 and 1,550 nm) for photonic communication systems. The Esaki tunnel junctions in these lasers have been used to connect adjacent cascade stages and to enable transport of charge carriers between them. Typically, large concentrations of both n (electron-donor) and p (electron-acceptor) dopants have been necessary to impart low electrical resistances to Esaki tunnel junctions. Unfortunately, high doping contributes free-carrier absorption, thereby contributing to optical loss and thereby, further, degrading laser performance. In accordance with the present innovation, quantum wells are incorporated into the Esaki tunnel junctions so that the effective heights of barriers to quantum tunneling are reduced (see figure).

  12. Bloch oscillating transistor-a new mesoscopic amplifier

    NASA Astrophysics Data System (ADS)

    Delahaye, J.; Hassel, J.; Lindell, R.; Sillanpää, M.; Paalanen, M.; Seppä, H.; Hakonen, P.

    2003-05-01

    Bloch oscillating transistor (BOT) is a novel, three-terminal Josephson junction device. Its operating principle utilizes the fact that Zener tunneling up to a higher band will lead to a blockade of coherent Cooper-pair tunneling, Bloch oscillation, in a suitably biased Josephson junction. The Bloch oscillation is resumed only after the junction has relaxed to the lowest band by quasiparticle tunneling. In this paper we present a simple model for the operation of the BOT and calculate its gain in terms of the interband transition rates.

  13. Development and fabrication of an augmented power transistor

    NASA Technical Reports Server (NTRS)

    Geisler, M. J.; Hill, F. E.; Ostop, J. A.

    1983-01-01

    The development of device design and processing techniques for the fabrication of an augmented power transistor capable of fast switching and high voltage power conversion is discussed. The major device goals sustaining voltages in the range of 800 to 1000 V at 80 A and 50 A, respectively, at a gain of 14. The transistor switching rise and fall times were both to have been less than 0.5 microseconds. The development of a passivating glass technique to shield the device high voltage junction from moisture and ionic contaminants is discussed as well as the development of an isolated package that separates the thermal and electrical interfaces. A new method was found to alloy the transistors to the molybdenum disc at a relatively low temperature. The measured electrical performance compares well with the predicted optimum design specified in the original proposed design. A 40 mm diameter transistor was fabricated with seven times the emitter area of the earlier 23 mm diameter device.

  14. Bipolar Disorder, Bipolar Depression and Comorbid Illness.

    PubMed

    Manning, J Sloan

    2015-06-01

    There is a substantial need for the early recognition and treatment of the psychiatric and medical comorbidities of bipolar disorder in primary care. If comorbid conditions are recognized and treated, serious adverse health outcomes may be averted, including substantial morbidity and mortality.

  15. Bipolar fuel cell

    DOEpatents

    McElroy, James F.

    1989-01-01

    The present invention discloses an improved fuel cell utilizing an ion transporting membrane having a catalytic anode and a catalytic cathode bonded to opposite sides of the membrane, a wet-proofed carbon sheet in contact with the cathode surface opposite that bonded to the membrane and a bipolar separator positioned in electrical contact with the carbon sheet and the anode of the adjacent fuel cell. Said bipolar separator and carbon sheet forming an oxidant flowpath, wherein the improvement comprises an electrically conductive screen between and in contact with the wet-proofed carbon sheet and the bipolar separator improving the product water removal system of the fuel cell.

  16. Specifics of Pulsed Arc Welding Power Supply Performance Based On A Transistor Switch

    NASA Astrophysics Data System (ADS)

    Krampit, N. Yu; Kust, T. S.; Krampit, M. A.

    2016-08-01

    Specifics of designing a pulsed arc welding power supply device are presented in the paper. Electronic components for managing large current was analyzed. Strengths and shortcomings of power supply circuits based on thyristor, bipolar transistor and MOSFET are outlined. As a base unit for pulsed arc welding was chosen MOSFET transistor, which is easy to manage. Measures to protect a transistor are given. As for the transistor control device is a microcontroller Arduino which has a low cost and adequate performance of the work. Bead transfer principle is to change the voltage on the arc in the formation of beads on the wire end. Microcontroller controls transistor when the arc voltage reaches the threshold voltage. Thus there is a separation and transfer of beads without splashing. Control strategies tested on a real device and presented. The error in the operation of the device is less than 25 us, it can be used controlling drop transfer at high frequencies (up to 1300 Hz).

  17. Bipolar disorder (image)

    MedlinePlus

    Bipolar disorder is a mood disorder characterized by episodes of mania and major depression. Treatment with lithium or mood stabilizers may be effective, but medication regimens are sometimes difficult to tolerate ...

  18. Genetics of bipolar disorder.

    PubMed

    Escamilla, Michael A; Zavala, Juan M

    2008-01-01

    Bipolar disorder especially the most severe type (type I), has a strong genetic component. Family studies suggest that a small number of genes of modest effect are involved in this disorder. Family-based studies have identified a number of chromosomal regions linked to bipolar disorder, and progress is currently being made in identifying positional candidate genes within those regions. A number of candidate genes have also shown evidence of association with bipolar disorder, and genome-wide association studies are now under way, using dense genetic maps. Replication studies in larger or combined datasets are needed to definitively assign a role for specific genes in this disorder. This review covers our current knowledge of the genetics of bipolar disorder, and provides a commentary on current approaches used to identify the genes involved in this complex behavioral disorder.

  19. Bipolar clavicular injury.

    PubMed

    Pang, K P; Yung, S W; Lee, T S; Pang, C E

    2003-10-01

    While clavicular injuries are fairly common, bipolar clavicular injuries are not. They may involve dislocations at both ends of the clavicle, or a fracture at one end and a dislocation at the other. We present two cases; a patient with a bipolar clavicular dislocation, and another with a fracture in both medial and lateral ends of the clavicle with anterior dislocation of the sternoclavicular joint. Both were treated conservatively, with fairly good range of motion and return to normal activity.

  20. Silicon-on-insulator-based high-voltage, high-temperature integrated circuit gate driver for silicon carbide-based power field effect transistors

    SciTech Connect

    Tolbert, Leon M; Huque, Mohammad A; Blalock, Benjamin J; Islam, Syed K

    2010-01-01

    Silicon carbide (SiC)-based field effect transistors (FETs) are gaining popularity as switching elements in power electronic circuits designed for high-temperature environments like hybrid electric vehicle, aircraft, well logging, geothermal power generation etc. Like any other power switches, SiC-based power devices also need gate driver circuits to interface them with the logic units. The placement of the gate driver circuit next to the power switch is optimal for minimising system complexity. Successful operation of the gate driver circuit in a harsh environment, especially with minimal or no heat sink and without liquid cooling, can increase the power-to-volume ratio as well as the power-to-weight ratio for power conversion modules such as a DC-DC converter, inverter etc. A silicon-on-insulator (SOI)-based high-voltage, high-temperature integrated circuit (IC) gate driver for SiC power FETs has been designed and fabricated using a commercially available 0.8--m, 2-poly and 3-metal bipolar-complementary metal oxide semiconductor (CMOS)-double diffused metal oxide semiconductor (DMOS) process. The prototype circuit-s maximum gate drive supply can be 40-V with peak 2.3-A sourcing/sinking current driving capability. Owing to the wide driving range, this gate driver IC can be used to drive a wide variety of SiC FET switches (both normally OFF metal oxide semiconductor field effect transistor (MOSFET) and normally ON junction field effect transistor (JFET)). The switching frequency is 20-kHz and the duty cycle can be varied from 0 to 100-. The circuit has been successfully tested with SiC power MOSFETs and JFETs without any heat sink and cooling mechanism. During these tests, SiC switches were kept at room temperature and ambient temperature of the driver circuit was increased to 200-C. The circuit underwent numerous temperature cycles with negligible performance degradation.

  1. Current-Induced Transistor Sensorics with Electrogenic Cells.

    PubMed

    Fromherz, Peter

    2016-04-25

    The concepts of transistor recording of electroactive cells are considered, when the response is determined by a current-induced voltage in the electrolyte due to cellular activity. The relationship to traditional transistor recording, with an interface-induced response due to interactions with the open gate oxide, is addressed. For the geometry of a cell-substrate junction, the theory of a planar core-coat conductor is described with a one-compartment approximation. The fast electrical relaxation of the junction and the slow change of ion concentrations are pointed out. On that basis, various recording situations are considered and documented by experiments. For voltage-gated ion channels under voltage clamp, the effects of a changing extracellular ion concentration and the enhancement/depletion of ion conductances in the adherent membrane are addressed. Inhomogeneous ion conductances are crucial for transistor recording of neuronal action potentials. For a propagating action potential, the effects of an axon-substrate junction and the surrounding volume conductor are distinguished. Finally, a receptor-transistor-sensor is described, where the inhomogeneity of a ligand-activated ion conductance is achieved by diffusion of the agonist and inactivation of the conductance. Problems with regard to a development of reliable biosensors are mentioned.

  2. Current-Induced Transistor Sensorics with Electrogenic Cells

    PubMed Central

    Fromherz, Peter

    2016-01-01

    The concepts of transistor recording of electroactive cells are considered, when the response is determined by a current-induced voltage in the electrolyte due to cellular activity. The relationship to traditional transistor recording, with an interface-induced response due to interactions with the open gate oxide, is addressed. For the geometry of a cell-substrate junction, the theory of a planar core-coat conductor is described with a one-compartment approximation. The fast electrical relaxation of the junction and the slow change of ion concentrations are pointed out. On that basis, various recording situations are considered and documented by experiments. For voltage-gated ion channels under voltage clamp, the effects of a changing extracellular ion concentration and the enhancement/depletion of ion conductances in the adherent membrane are addressed. Inhomogeneous ion conductances are crucial for transistor recording of neuronal action potentials. For a propagating action potential, the effects of an axon-substrate junction and the surrounding volume conductor are distinguished. Finally, a receptor-transistor-sensor is described, where the inhomogeneity of a ligand–activated ion conductance is achieved by diffusion of the agonist and inactivation of the conductance. Problems with regard to a development of reliable biosensors are mentioned. PMID:27120627

  3. Tunneling modulation of a quantum-well transistor laser

    NASA Astrophysics Data System (ADS)

    Feng, M.; Qiu, J.; Wang, C. Y.; Holonyak, N.

    2016-11-01

    Different than the Bardeen and Brattain transistor (1947) with the current gain depending on the ratio of the base carrier spontaneous recombination lifetime to the emitter-collector transit time, the Feng and Holonyak transistor laser current gain depends upon the base electron-hole (e-h) stimulated recombination, the base dielectric relaxation transport, and the collector stimulated tunneling. For the n-p-n transistor laser tunneling operation, the electron-hole pairs are generated at the collector junction under the influence of intra-cavity photon-assisted tunneling, with electrons drifting to the collector and holes drifting to the base. The excess charge in the base lowers the emitter junction energy barrier, allowing emitter electron injection into the base and satisfying charge neutrality via base dielectric relaxation transport (˜femtoseconds). The excess electrons near the collector junction undergo stimulated recombination at the base quantum-well or transport to the collector, thus supporting tunneling current amplification and optical modulation of the transistor laser.

  4. Design considerations for the Tandem Junction Solar Cell

    NASA Technical Reports Server (NTRS)

    Matzen, W. T.; Carbajal, B. G.; Hardy, R. W.

    1979-01-01

    Structure and operation of the tandem junction cell (TJC) are described. The impact of using only back contacts is discussed. A model is presented which explains operation of the TJC in terms of transistor action. The model is applied to predict TJC performance as a function of physical parameters.

  5. Brownian refrigeration by hybrid tunnel junctions

    NASA Astrophysics Data System (ADS)

    Peltonen, J. T.; Helle, M.; Timofeev, A. V.; Solinas, P.; Hekking, F. W. J.; Pekola, J. P.

    2011-10-01

    Voltage fluctuations generated in a hot resistor can cause extraction of heat from a colder normal metal electrode of a hybrid tunnel junction between a normal metal and a superconductor. We extend the analysis presented in Phys. Rev. Lett.PRLTAO0031-900710.1103/PhysRevLett.98.210604 98, 210604 (2007) of this heat rectifying system, bearing resemblance to a Maxwell’s demon. Explicit analytic calculations show that the entropy of the total system is always increasing. We then consider a single-electron transistor configuration with two hybrid junctions in series, and show how the cooling is influenced by charging effects. We analyze also the cooling effect from nonequilibrium fluctuations instead of thermal noise, focusing on the shot noise generated in another tunnel junction. We conclude by discussing limitations for an experimental observation of the effect.

  6. Soft switch-avalanche IGBT convertor. [Insulated Gate Bipolar Transistor

    NASA Technical Reports Server (NTRS)

    Chen, K.; Stuart, T. A.

    1990-01-01

    A full bridge dc-dc converter using a zero voltage and zero current switching technique is described. This circuit utilizes the characteristics of the IGBT to achieve power and frequency combinations that are much higher than those previously reported for this device. Experimental results are included for a 1.5 kW, 100 kHz converter with 94 percent efficiency.

  7. Fabrication of a Silicon MOSFET Device with Bipolar Transistor Source,

    DTIC Science & Technology

    1980-07-01

    orange •" 0.426 Carnation pink ;’•• 0.443 0.465 Violet-red Red-violet «4 • B 0.476 Violet ,’A B 0.480...8217_/ light creamy grey or metallic.) ! 1 ft "•r 0.585 Light- orange or yellow to pink borderline ",- ’•" 0.600 Carnation pink ia 0.63Q Violet-red...Dull yellow-green 0.97 Yellow to "yellowish" 0.99 Orange 1.00 Carnation pink 1.02 Violet-red 1.05 Red-violet 1.06 Violet 1.07 Blue-violet

  8. Crossed Andreev reflection in a graphene bipolar transistor.

    PubMed

    Cayssol, J

    2008-04-11

    We investigate the crossed Andreev reflections between two graphene leads connected by a narrow superconductor. When the leads are, respectively, of the n and p type, we find that electron elastic cotunneling and local Andreev reflection are both eliminated even in the absence of any valley-isospin or spin polarizations. We further predict oscillations of both diagonal and cross conductances as a function of the distance between the graphene-superconductor interfaces.

  9. Copper oxide transistor on copper wire for e-textile

    NASA Astrophysics Data System (ADS)

    Han, Jin-Woo; Meyyappan, M.

    2011-05-01

    A Cu2O-based field effect transistor was fabricated on Cu wire. Thermal oxidation of Cu forms Cu-Cu2O core-shell structure, where the metal-semiconductor Schottky junction was used as a gate barrier with Pt Ohmic contacts for source and drain. The device was coated with polydimethylsiloxane (PDMS) to protect from contamination and demonstrated as a humidity sensor. The cylindrical structure of the Cu wire and the transistor function enable embedding of simple circuits into textile which can potentially offer smart textile for wearable computing, environmental sensing, and monitoring of human vital signs.

  10. Single transistor latch phenomenon in junctionless transistors

    NASA Astrophysics Data System (ADS)

    Singh Parihar, Mukta; Ghosh, Dipankar; Kranti, Abhinav

    2013-05-01

    In this work, we report on the single transistor latch phenomenon in junctionless transistors. In the latch condition, the device is unable to turn-off despite a reduction in gate bias. It is shown that impact ionization induced latch condition can occur due to an increase in drain bias, silicon film thickness, gate oxide thickness, and doping concentration. The latch phenomenon is explained in terms of generation-recombination rates, electrostatic potential, electric field distribution and product of current density and electric field (J.E). As latch condition is undesirable for dynamic memory applications, the work highlights the significance of (J.E) as a performance metric to avoid the junctionless transistor being driven into the latch mode.

  11. Theory of the Bloch oscillating transistor

    NASA Astrophysics Data System (ADS)

    Hassel, J.; Seppä, H.

    2005-01-01

    The Bloch oscillating transistor (BOT) is a device in which single electron current through a normal tunnel junction enhances Cooper pair current in a mesoscopic Josephson junction, leading to signal amplification. In this article we develop a theory in which the BOT dynamics is described as a two-level system. The theory is used to predict current-voltage characteristics and small-signal response. The transition from stable operation into the hysteretic regime is studied. By identifying the two-level switching noise as the main source of fluctuations, the expressions for equivalent noise sources and the noise temperature are derived. The validity of the model is tested by comparing the results with simulations and experiments.

  12. Lightweight bipolar storage battery

    NASA Technical Reports Server (NTRS)

    Rowlette, John J. (Inventor)

    1992-01-01

    An apparatus [10] is disclosed for a lightweight bipolar battery of the end-plate cell stack design. Current flow through a bipolar cell stack [12] is collected by a pair of copper end-plates [16a,16b] and transferred edgewise out of the battery by a pair of lightweight, low resistance copper terminals [28a,28b]. The copper terminals parallel the surface of a corresponding copper end-plate [16a,16b] to maximize battery throughput. The bipolar cell stack [12], copper end-plates [16a,16b] and copper terminals [28a,28b] are rigidly sandwiched between a pair of nonconductive rigid end-plates [20] having a lightweight fiber honeycomb core which eliminates distortion of individual plates within the bipolar cell stack due to internal pressures. Insulating foam [30] is injected into the fiber honeycomb core to reduce heat transfer into and out of the bipolar cell stack and to maintain uniform cell performance. A sealed battery enclosure [ 22] exposes a pair of terminal ends [26a,26b] for connection with an external circuit.

  13. Bipolar Medications and Weight Gain

    MedlinePlus

    Bipolar medications and weight gain Do all bipolar medications cause weight gain? Answers from Daniel K. Hall-Flavin, M. ... disorder can be treated with a number of medications. Some of these medications can increase your appetite ...

  14. Depression and Bipolar Support Alliance

    MedlinePlus

    Depression and Bipolar Support Alliance Crisis Hotline Information Coping with a Crisis Suicide Prevention Information Psychiatric Hospitalization ... sign-up Education info, training, events Mood Disorders Depression Bipolar Disorder Anxiety Screening Center Co-occurring Illnesses/ ...

  15. Room temperature operational single electron transistor fabricated by focused ion beam deposition

    NASA Astrophysics Data System (ADS)

    Karre, P. Santosh Kumar; Bergstrom, Paul L.; Mallick, Govind; Karna, Shashi P.

    2007-07-01

    We present the fabrication and room temperature operation of single electron transistors using 8nm tungsten islands deposited by focused ion beam deposition technique. The tunnel junctions are fabricated using oxidation of tungsten in peracetic acid. Clear Coulomb oscillations, showing charging and discharging of the nanoislands, are seen at room temperature. The device consists of an array of tunnel junctions; the tunnel resistance of individual tunnel junction of the device is calculated to be as high as 25.13GΩ. The effective capacitance of the array of tunnel junctions was found to be 0.499aF, giving a charging energy of 160.6meV.

  16. From The Lab to The Fab: Transistors to Integrated Circuits

    NASA Astrophysics Data System (ADS)

    Huff, Howard R.

    2003-09-01

    Transistor action was experimentally observed by John Bardeen and Walter Brattain in n-type polycrystalline germanium on December 16, 1947 (and subsequently polycrystalline silicon) as a result of the judicious placement of gold-plated probe tips in nearby single crystal grains of the polycrystalline material (i.e., the point-contact semiconductor amplifier, often referred to as the point-contact transistor).The device configuration exploited the inversion layer as the channel through which most of the emitted (minority) carriers were transported from the emitter to the collector. The point-contact transistor was manufactured for ten years starting in 1951 by the Western Electric Division of AT&T. The a priori tuning of the point-contact transistor parameters, however, was not simple inasmuch as the device was dependent on the detailed surface structure and, therefore, very sensitive to humidity and temperature as well as exhibiting high noise levels. Accordingly, the devices differed significantly in their characteristics and electrical instabilities leading to "burnout" were not uncommon. With the implementation of crystalline semiconductor materials in the early 1950s, however, p-n junction (bulk) transistors began replacing the point-contact transistor, silicon began replacing germanium and the transfer of transistor technology from the lab to the lab accelerated. We shall review the historical route by which single crystalline materials were developed and the accompanying methodologies of transistor fabrication, leading to the onset of the Integrated Circuit (IC) era. Finally, highlights of the early years of the IC era will be reviewed from the 256 bit through the 4M DRAM. Elements of IC scaling and the role of Moore's Law in setting the parameters by which the IC industry's growth was monitored will be discussed.

  17. Application of Silicon Selective Epitaxial Growth and Chemo-Mechanical Polishing to Bipolar and Soi Mosfet Devices.

    NASA Astrophysics Data System (ADS)

    Nguyen, Cuong Tan

    1994-01-01

    Polished Epitaxy, or the combination of silicon Selective Epitaxial Growth and Chemo-Mechanical Polishing, provides new flexibility in process and device design, including optimized isolation, planar active-area definition, low-capacitance contacts, and SOI thin films. In this work, Polished Epitaxy has been developed with particular effort on overcoming junction leakage problems widely reported in devices fabricated in similar processes. It was found that in addition to careful surface preparation and defect control in the selective epitaxy process, issues such as sidewall orientation, junction passivation, crystal annealing, and surface damage removal were equally important and needed to be addressed. Coupled with the proper processing steps, Polished Epitaxy was able to deliver material of comparable quality to bulk silicon, suitable for device applications. By growing epitaxy laterally over an oxide step followed by polishing, a pedestal structure was created in which a thin film of single-crystal silicon was formed over oxide. Serving as the extrinsic base contact to a T-Pedestal bipolar transistor device, this pedestal helped minimize the parasitic extrinsic-base-collector overlap capacitance. The cut-off frequency (f_ {T}) in a device with a 1.0-mu m wide emitter stripe was found to improve from 17GHz to 22GHz when the contact overlap was reduced from a more conventional, larger size of 1.0 mu m to 0.2 mum. It is expected that the high-frequency performance of this structure can still be improved further in an optimized process with reduced emitter and collector resistances. The same pedestal structure was applied to a Pedestal -SOI (Silicon-On-Insulator) MOSFET device concept. At one extreme, a conventional bulk MOSFET structure is obtained when the pedestal is not utilized; quasi-SOI occurs when the drain and part of the channel overlap with the pedestal over buried oxide; at the other extreme, complete-SOI behavior results when source, channel, and drain

  18. Is Cognitive Style Bipolar?

    ERIC Educational Resources Information Center

    Schroeder, David H.

    This study assessed the bipolarity of cognitive style for 970 clients of the Johnson O'Connor Research Foundation, a vocational guidance service. The 462 male and 508 female examinees were aged 14 to 65 years, with a median age of 24 years. Three cognitive style tests were investigated: (1) the Kagan Matching Familiar Figures Test (KMFFT); (2) the…

  19. Study of improved reverse recovery in power transistor incorporating universal contact

    NASA Astrophysics Data System (ADS)

    Anand, R. S.; Mazhari, B.; Narain, J.

    2004-05-01

    The improvement in reverse recovery of power NPN bipolar transistor (BJT) through incorporation of "universal contact" in the base is studied in detail. It is shown that use of universal contact allows redistribution of base current in saturation from collector region where recombination lifetime is high to extrinsic base region where effective recombination lifetime is low. The reverse recovery time decreases as collector current density increases but increases as collector breakdown voltage increases. The improvement in reverse recovery is accompanied with an increase in collector-emitter voltage in the ON state. For low voltage transistors and high voltage transistors at low collector current densities, the increase is primarily due to reduction in reverse current gain. For high breakdown voltage transistors, the use of universal contact results in early onset of quasi-saturation effect and results in degradation in ON state voltage at high collector current densities.

  20. High Power Switching Transistor

    NASA Technical Reports Server (NTRS)

    Hower, P. L.; Kao, Y. C.; Carnahan, D. C.

    1983-01-01

    Improved switching transistors handle 400-A peak currents and up to 1,200 V. Using large diameter silicon wafers with twice effective area as D60T, form basis for D7 family of power switching transistors. Package includes npn wafer, emitter preform, and base-contact insert. Applications are: 25to 50-kilowatt high-frequency dc/dc inverters, VSCF converters, and motor controllers for electrical vehicles.

  1. A TRANSISTORIZED RELAY SERVO.

    DTIC Science & Technology

    DC motor is achieved with standard power transistors and a simple transistorized preamplifier, A permanent magnet, DC motor is used as the test vehicle to illustrate the feasibility of control without an amplidyne or mechanical relay. The ’bang-bang’, capability of the controller to operate as a near-ideal ’relay’ is emphasized. The inherent flexibility allowed in selecting the switching characteristics is also demonstrated. The discussion points toward practical application and stresses the analysis of the switching

  2. Transistor-based interface circuitry

    DOEpatents

    Taubman, Matthew S.

    2007-02-13

    Among the embodiments of the present invention is an apparatus that includes a transistor, a servo device, and a current source. The servo device is operable to provide a common base mode of operation of the transistor by maintaining an approximately constant voltage level at the transistor base. The current source is operable to provide a bias current to the transistor. A first device provides an input signal to an electrical node positioned between the emitter of the transistor and the current source. A second device receives an output signal from the collector of the transistor.

  3. Transistor-based interface circuitry

    DOEpatents

    Taubman, Matthew S.

    2004-02-24

    Among the embodiments of the present invention is an apparatus that includes a transistor, a servo device, and a current source. The servo device is operable to provide a common base mode of operation of the transistor by maintaining an approximately constant voltage level at the transistor base. The current source is operable to provide a bias current to the transistor. A first device provides an input signal to an electrical node positioned between the emitter of the transistor and the current source. A second device receives an output signal from the collector of the transistor.

  4. Preventing Simultaneous Conduction In Switching Transistors

    NASA Technical Reports Server (NTRS)

    Mclyman, William T.

    1990-01-01

    High voltage spikes and electromagnetic interference suppressed. Power-supply circuit including two switching transistors easily modified to prevent simultaneous conduction by both transistors during switching intervals. Diode connected between collector of each transistor and driving circuit for opposite transistor suppresses driving signal to transistor being turned on until transistor being turned off ceases to carry current.

  5. A comparison of radiation damage in transistors from cobalt-60 gamma rays and 2.2 MeV electrons

    NASA Technical Reports Server (NTRS)

    Nichols, D. K.; Price, W. E.; Gauthier, M. K.

    1982-01-01

    The total ionizing dose response of ten bipolar transistor types has been measured using Co-60 gamma rays and 2.2 MeV electrons from exposure levels of 750, 1500, and 3000 Gy(Si). Gain measurements were made for a range of collector-emitter voltages and collector currents.

  6. Total Dose Effects on Single Event Transients in Digital CMOS and Linear Bipolar Circuits

    NASA Technical Reports Server (NTRS)

    Buchner, S.; McMorrow, D.; Sibley, M.; Eaton, P.; Mavis, D.; Dusseau, L.; Roche, N. J-H.; Bernard, M.

    2009-01-01

    This presentation discusses the effects of ionizing radiation on single event transients (SETs) in circuits. The exposure of integrated circuits to ionizing radiation changes electrical parameters. The total ionizing dose effect is observed in both complementary metal-oxide-semiconductor (CMOS) and bipolar circuits. In bipolar circuits, transistors exhibit grain degradation, while in CMOS circuits, transistors exhibit threshold voltage shifts. Changes in electrical parameters can cause changes in single event upset(SEU)/SET rates. Depending on the effect, the rates may increase or decrease. Therefore, measures taken for SEU/SET mitigation might work at the beginning of a mission but not at the end following TID exposure. The effect of TID on SET rates should be considered if SETs cannot be tolerated.

  7. Fabrication and characterization of heterojunction transistors

    NASA Astrophysics Data System (ADS)

    Lo, Chien-Fong

    2011-12-01

    Submircon emitter finger high-speed double heterojunction InAlAs/InGaAsSb/InGaAs bipolar transistors (DHBTs) and a variety of nitride high electron mobility transistors (HEMTs) including AlGaN/GaN, InAlN/GaN, and AlN/GaN were fabricated and characterized. DHBT structures were grown by solid source molecular beam epitaxy (SSMBE) on Fe-doped semiinsulating InP substrates and nitride HEMTs were grown with a metal organic chemical vapor deposition (MOCVD) system on sapphire or SiC substrates. AlN/GaN HEMTs were grown with a RF-VMBE on sapphire substrates. Ultra low base contact resistance of 3.7 x 10-7 ohm-cm2 after 1 min 250¢XC thermal treatment on noval InGaAsSb base of DHBTs was achieved and a long-term thermal stability of base metallization was studied. Regarding small scale DHBT fabrication, tri-layer system was introduced to improve the resolution for submicron emitter patterning and help to pile up a thicker emitter metal stack; guard-ring technique was applied around the emitter periphery in order to preserve the current gain at small emitter dimensions. Ultra low turn-on voltage and high current gain can be realized with InGaAsSb-base DHBTs as compared to the conventional InGaAs-base DHBTs. A peak current gain cutoff frequency (fT) of 268 GHz and power gain cutoff frequency (fmax) of 485 GHz were achieved. GaN-based HEMTs herein were fabricated with gate lengths from 400 nm to 1im, and were deposited Ti/Al/Ni/Au as their Ohmic contact metallization. Effects of the Ohmic contact annealing for lattice-matched InAlN/GaN HEMTs with and without a thin GaN cap layer were exhibited and their optimal annealing temperature were obtained. A maximum drain current of 1.3 A/mm and an extrinsic transconductance of 366 mS/mm were demonstrated for InAlN/GaN HEMTs with the shortest gate length. A unity-gain cutoff frequency (fT) of 69 GHz and a maximum frequency of oscillation (fmax) of 80 GHz for InAlN/GaN HEMTs were extracted from measured scattering parameters

  8. Electronic conduction in a model three-terminal molecular transistor.

    PubMed

    He, Haiying; Pandey, Ravindra; Karna, Shashi P

    2008-12-17

    The electronic conduction of a novel, three-terminal molecular architecture, analogous to a heterojunction bipolar transistor, is studied. In this architecture, two diode arms consisting of donor-acceptor molecular wires fuse through a ring, while a gate modulating wire is a pi-conjugated wire. The calculated results show the enhancement or depletion mode of a transistor on applying a gate field along the positive or negative direction. A small gate field is required to switch on the current in the proposed architecture. The changes in the electronic conduction can be attributed to the intrinsic dipolar molecular architecture in terms of the evolution of molecular wavefunctions, specifically the one associated with the terphenyl group of the modulating wire in the presence of the gate field.

  9. Electroluminescence from single-wall carbon nanotube network transistors.

    PubMed

    Adam, E; Aguirre, C M; Marty, L; St-Antoine, B C; Meunier, F; Desjardins, P; Ménard, D; Martel, R

    2008-08-01

    The electroluminescence (EL) properties from single-wall carbon nanotube network field-effect transistors (NNFETs) and small bundle carbon nanotube field effect transistors (CNFETs) are studied using spectroscopy and imaging in the near-infrared (NIR). At room temperature, NNFETs produce broad (approximately 180 meV) and structured NIR spectra, while they are narrower (approximately 80 meV) for CNFETs. EL emission from NNFETs is located in the vicinity of the minority carrier injecting contact (drain) and the spectrum of the emission is red shifted with respect to the corresponding absorption spectrum. A phenomenological model based on a Fermi-Dirac distribution of carriers in the nanotube network reproduces the spectral features observed. This work supports bipolar (electron-hole) current recombination as the main mechanism of emission and highlights the drastic influence of carrier distribution on the optoelectronic properties of carbon nanotube films.

  10. Optimisation of add-on NPN Transistor for a CMOS Process

    NASA Astrophysics Data System (ADS)

    Aurola, Artto; Ronkainen, Hannu; Mellin, Joni

    2004-01-01

    The objective of this research was to add an npn-bipolar transistor for a CMOS process. This was to be done with minimal additional process steps and without changing any existing CMOS parameters. The minimum line width of the process was 1.2µm, the wafers were p-type and 100mm in diameter and no epitaxial or polysilicon layers were used. To minimise the additional process steps a triple diffused transistor was selected as the basis of the research. The emitter was formed from a diffusion contacting NMOSFET source and drain to aluminium. As collector diffusion two approaches were investigated the pnpbipolar transistors isolation nwell and the PMOSFET n-well. The only additional step to the CMOS process due to the npn-transistor fabrication resulted from the formation of base diffusion. The specifications for the npn-transistor were 80 for the current gain, 100V for the early voltage and 60MHz for the transition frequency at 1µA collector current. Four different transistor structures were investigated two octagonal transistors having either emitter or base in the centre and two minimum area rectangular transistors having either base or emitter in the middle. The octagonal transistor having the emitter in the centre was chosen as the basis of simulations. It was first simulated with a device simulator. Next combined process and device simulations were done. Based on simulation results different processes were tested on wafers. Only the octagonal transistor having the emitter in the middle satisfied the specifications when a pnp isolation n-well was used as a collector.

  11. Pleated metal bipolar assembly

    DOEpatents

    Wilson, Mahlon S.; Zawodzinski, Christine

    2001-01-01

    A thin low-cost bipolar plate for an electrochemical cell is formed from a polymer support plate with first flow channels on a first side of the support plate and second flow channels on a second side of the support plate, where the first flow channels and second flow channels have intersecting locations and have a depth effective to form openings through the support plate at the intersecting locations. A first foil of electrically conductive material is pressed into the first flow channels. A second foil of electrically conductive material pressed into the second flow channels so that electrical contact is made between the first and second foils at the openings through the support plate. A particular application of the bipolar plate is in polymer electrolyte fuel cells.

  12. Epilepsy and bipolar disorder.

    PubMed

    Knott, Sarah; Forty, Liz; Craddock, Nick; Thomas, Rhys H

    2015-11-01

    It is well recognized that mood disorders and epilepsy commonly co-occur. Despite this, our knowledge regarding the relationship between epilepsy and bipolar disorder is limited. Several shared features between the two disorders, such as their episodic nature and potential to run a chronic course, and the efficacy of some antiepileptic medications in the prophylaxis of both disorders, are often cited as evidence of possible shared underlying pathophysiology. The present paper aims to review the bidirectional associations between epilepsy and bipolar disorder, with a focus on epidemiological links, evidence for shared etiology, and the impact of these disorders on both the individual and wider society. Better recognition and understanding of these two complex disorders, along with an integrated clinical approach, are crucial for improved evaluation and management of comorbid epilepsy and mood disorders.

  13. New high-performance complementary bipolar technology featuring 45-GHz NPN and 20-GHz PNP devices

    NASA Astrophysics Data System (ADS)

    Wilson, Martin C.; Osborne, Peter H.; Thomas, Simon; Cook, Trevor

    1999-09-01

    A new high performance silicon complementary bipolar technology is introduced. In addition a novel process 'enhancement' technique based on a local oxidation is described and demonstrated and NPN devices with cut-off frequencies up to 45GHz and PNP devices of 20GHz have been fabricate. We propose that the technique we have used will allow specific transistors within a circuit to be optimized, as required.

  14. [Creativity and bipolar disorder].

    PubMed

    Maçkalı, Zeynep; Gülöksüz, Sinan; Oral, Timuçin

    2014-01-01

    The relationship between creativity and bipolar disorder has been an intriguing topic since ancient times. Early studies focused on describing characteristics of creative people. From the last quarter of the twentieth century, researchers began to focus on the relationship between mood disorders and creativity. Initially, the studies were based on biographical texts and the obtained results indicated a relationship between these two concepts. The limitations of the retrospective studies led the researchers to develop systematic investigations into this area. The systematic studies that have focused on artistic creativity have examined both the prevalence of mood disorders and the creative process. In addition, a group of researchers addressed the relationship in terms of affective temperaments. Through the end of the 90's, the scope of creativity was widened and the notion of everyday creativity was proposed. The emergence of this notion led researchers to investigate the associations of the creative process in ordinary (non-artist) individuals. In this review, the descriptions of creativity and creative process are mentioned. Also, the creative process is addressed with regards to bipolar disorder. Then, the relationship between creativity and bipolar disorder are evaluated in terms of aforementioned studies (biographical, systematic, psychobiographical, affective temperaments). In addition, a new model, the "Shared Vulnerability Model" which was developed to explain the relationship between creativity and psychopathology is introduced. Finally, the methodological limitations and the suggestions for resolving these limitations are included.

  15. Bipolar Disorder in Children and Teens

    MedlinePlus

    ... is in crisis. What do I do? Share Bipolar Disorder in Children and Teens Download PDF Download ePub ... brochure will give you more information. What is bipolar disorder? Bipolar disorder is a serious brain illness. It ...

  16. Studies of silicon p-n junction solar cells

    NASA Technical Reports Server (NTRS)

    Neugroschel, A.; Lindholm, F. A.

    1979-01-01

    To provide theoretical support for investigating different ways to obtain high open-circuit voltages in p-n junction silicon solar cells, an analytical treatment of heavily doped transparent-emitter devices is presented that includes the effects of bandgap narrowing, Fermi-Dirac statistics, a doping concentration gradient, and a finite surface recombination velocity at the emitter surface. Topics covered include: (1) experimental determination of bandgap narrowing in the emitter of silicon p-n junction devices; (2) heavily doped transparent regions in junction solar cells, diodes, and transistors; (3) high-low-emitter solar cell; (4) determination of lifetimes and recombination currents in p-n junction solar cells; (5) MOS and oxide-charged-induced BSF solar cells; and (6) design of high efficiency solar cells for space and terrestrial applications.

  17. Metallic field effect transistors

    NASA Astrophysics Data System (ADS)

    Farooq, Hassan

    This thesis investigates the principle of operation behind metallic-field effect transistors (METFETs) through a systematic study of atomistic simulations performed on metallic bulk, nanowire and transistor structures. In particular, density functional theory (DFT) and non-equilibrium green's function (NEGF) based models were used to study the effect on the bandstructure and density of states of highly scaled metallic nanowires with varying parameters such as crystal orientation, cross-sectional area, and applied external bias. Similarly, the effect of varying similar parameters on the transfer and output characteristics of highly scaled metallic transistors was studied. Furthermore, oxide interfaces with metallic channels were investigated. The simulation results show that a gold METFET in the [100] crystal orientation has an I ON /IOFF ratio of 41, ION of 29.5microA and fT of 6.7THz, outperforming similarly sized MOSFETs as a promising alternative for use in high-frequency circuits.

  18. Edge mixing dynamics in graphene p-n junctions in the quantum Hall regime

    NASA Astrophysics Data System (ADS)

    Matsuo, Sadashige; Takeshita, Shunpei; Tanaka, Takahiro; Nakaharai, Shu; Tsukagoshi, Kazuhito; Moriyama, Takahiro; Ono, Teruo; Kobayashi, Kensuke

    2015-09-01

    Massless Dirac electron systems such as graphene exhibit a distinct half-integer quantum Hall effect, and in the bipolar transport regime co-propagating edge states along the p-n junction are realized. Additionally, these edge states are uniformly mixed at the junction, which makes it a unique structure to partition electrons in these edge states. Although many experimental works have addressed this issue, the microscopic dynamics of electron partition in this peculiar structure remains unclear. Here we performed shot-noise measurements on the junction in the quantum Hall regime as well as at zero magnetic field. We found that, in sharp contrast with the zero-field case, the shot noise in the quantum Hall regime is finite in the bipolar regime, but is strongly suppressed in the unipolar regime. Our observation is consistent with the theoretical prediction and gives microscopic evidence that the edge states are uniquely mixed along the p-n junction.

  19. VOLTAGE-CONTROLLED TRANSISTOR OSCILLATOR

    DOEpatents

    Scheele, P.F.

    1958-09-16

    This patent relates to transistor oscillators and in particular to those transistor oscillators whose frequencies vary according to controlling voltages. A principal feature of the disclosed transistor oscillator circuit resides in the temperature compensation of the frequency modulating stage by the use of a resistorthermistor network. The resistor-thermistor network components are selected to have the network resistance, which is in series with the modulator transistor emitter circuit, vary with temperature to compensate for variation in the parameters of the transistor due to temperature change.

  20. Ambipolar nonvolatile memory based on a quantum-dot transistor with a nanoscale floating gate

    NASA Astrophysics Data System (ADS)

    Che, Yongli; Zhang, Yating; Cao, Xiaolong; Song, Xiaoxian; Cao, Mingxuan; Dai, Haitao; Yang, Junbo; Zhang, Guizhong; Yao, Jianquan

    2016-07-01

    Using only solution processing methods, we developed ambipolar quantum-dot (QD) transistor floating-gate memory (FGM) that uses Au nanoparticles as a floating gate. Because of the bipolarity of the active channel of PbSe QDs, the memory could easily trap holes or electrons in the floating gate by programming/erasing (P/E) operations, which could shift the threshold voltage both up and down. As a result, the memory exhibited good programmable memory characteristics: a large memory window (ΔVth ˜ 15 V) and a long retention time (>105 s). The magnitude of ΔVth depended on both P/E voltages and the bias voltage (VDS): ΔVth was a cubic function to VP/E and linearly depended on VDS. Therefore, this FGM based on a QD transistor is a promising alternative to its inorganic counterparts owing to its advantages of bipolarity, high mobility, low cost, and large-area production.

  1. Accelerating the life of transistors

    NASA Astrophysics Data System (ADS)

    Haochun, Qi; Changzhi, Lü; Xiaoling, Zhang; Xuesong, Xie

    2013-06-01

    Choosing small and medium power switching transistors of the NPN type in a 3DK set as the study object, the test of accelerating life is conducted in constant temperature and humidity, and then the data are statistically analyzed with software developed by ourselves. According to degradations of such sensitive parameters as the reverse leakage current of transistors, the lifetime order of transistors is about more than 104 at 100 °C and 100% relative humidity (RH) conditions. By corrosion fracture of transistor outer leads and other failure modes, with the failure truncated testing, the average lifetime rank of transistors in different distributions is extrapolated about 103. Failure mechanism analyses of degradation of electrical parameters, outer lead fracture and other reasons that affect transistor lifetime are conducted. The findings show that the impact of external stress of outer leads on transistor reliability is more serious than that of parameter degradation.

  2. Epithelial adhesive junctions

    PubMed Central

    Capaldo, Christopher T.; Farkas, Attila E.

    2014-01-01

    Epithelial adhesive cell-to-cell contacts contain large, plasma membrane-spanning multiprotein aggregates that perform vital structural and signaling functions. Three prominent adhesive contacts are the tight junction, adherens junction, and the desmosome. Each junction type has unique cellular functions and a complex molecular composition. In this review, we comment on recent and exciting advances in our understanding of junction composition and function. PMID:24592313

  3. Carrier injection dynamics in heterojunction solar cells with bipolar molecule

    SciTech Connect

    Takahashi, Yosuke; Yonezawa, Kouhei; Yasuda, Takeshi E-mail: moritomo.yutaka.gf@u.tsukuba.ac.jp; Moritomo, Yutaka E-mail: moritomo.yutaka.gf@u.tsukuba.ac.jp

    2015-03-23

    A boron subphthalocyanine chloride (SubPc) is a bipolar molecule and is used in hetero-junction organic solar cells. Here, we investigated the carrier injection dynamics from the donor α-sexithiophene (6T) or acceptor C{sub 60} layers to the bipolar SubPc layer by means of the femtosecond time-resolved spectroscopy. We observed gradual increase of the SubPc{sup –} (SubPc{sup +}) species within ≈300 ps. The increases are interpreted in terms of the exciton diffusion within the 6T (C{sub 60}) layer and subsequent electron (hole) injection at the interface. In 6T/SubPc heterojunction, the electron injection is observed even at 80 K. The robust electron injection is ascribed to the efficient charge separation within the 6T layer under photo exciation at 400 nm.

  4. Analyses of Transistor Punchthrough Failures

    NASA Technical Reports Server (NTRS)

    Nicolas, David P.

    1999-01-01

    The failure of two transistors in the Altitude Switch Assembly for the Solid Rocket Booster followed by two additional failures a year later presented a challenge to failure analysts. These devices had successfully worked for many years on numerous missions. There was no history of failures with this type of device. Extensive checks of the test procedures gave no indication for a source of the cause. The devices were manufactured more than twenty years ago and failure information on this lot date code was not readily available. External visual exam, radiography, PEID, and leak testing were performed with nominal results Electrical testing indicated nearly identical base-emitter and base-collector characteristics (both forward and reverse) with a low resistance short emitter to collector. These characteristics are indicative of a classic failure mechanism called punchthrough. In failure analysis punchthrough refers to an condition where a relatively low voltage pulse causes the device to conduct very hard producing localized areas of thermal runaway or "hot spots". At one or more of these hot spots, the excessive currents melt the silicon. Heavily doped emitter material diffuses through the base region to the collector forming a diffusion pipe shorting the emitter to base to collector. Upon cooling, an alloy junction forms between the pipe and the base region. Generally, the hot spot (punch-through site) is under the bond and no surface artifact is visible. The devices were delidded and the internal structures were examined microscopically. The gold emitter lead was melted on one device, but others had anomalies in the metallization around the in-tact emitter bonds. The SEM examination confirmed some anomalies to be cosmetic defects while other anomalies were artifacts of the punchthrough site. Subsequent to these analyses, the contractor determined that some irregular testing procedures occurred at the time of the failures heretofore unreported. These testing

  5. Wideband rotating junctions

    NASA Astrophysics Data System (ADS)

    Pochernyaev, V. N.

    1993-06-01

    Rotating junctions of coaxial-waveguide and waveguide type with a traveling wave coefficient exceeding 0.8 in a wide frequency range are considered. The design of these junctions is based on a method of the theory of electrodynamic circuits. Numerical results are obtained for rotating junctions of partially filled rectangular waveguide type and their particular cases.

  6. Radiation-hardened transistor and integrated circuit

    DOEpatents

    Ma, Kwok K.

    2007-11-20

    A composite transistor is disclosed for use in radiation hardening a CMOS IC formed on an SOI or bulk semiconductor substrate. The composite transistor has a circuit transistor and a blocking transistor connected in series with a common gate connection. A body terminal of the blocking transistor is connected only to a source terminal thereof, and to no other connection point. The blocking transistor acts to prevent a single-event transient (SET) occurring in the circuit transistor from being coupled outside the composite transistor. Similarly, when a SET occurs in the blocking transistor, the circuit transistor prevents the SET from being coupled outside the composite transistor. N-type and P-type composite transistors can be used for each and every transistor in the CMOS IC to radiation harden the IC, and can be used to form inverters and transmission gates which are the building blocks of CMOS ICs.

  7. Modeling of transient ionizing radiation effects in bipolar devices at high dose-rates

    SciTech Connect

    FJELDLY,T.A.; DENG,Y.; SHUR,M.S.; HJALMARSON,HAROLD P.; MUYSHONDT,ARNOLDO

    2000-04-25

    To optimally design circuits for operation at high intensities of ionizing radiation, and to accurately predict their a behavior under radiation, precise device models are needed that include both stationary and dynamic effects of such radiation. Depending on the type and intensity of the ionizing radiation, different degradation mechanisms, such as photoelectric effect, total dose effect, or single even upset might be dominant. In this paper, the authors consider the photoelectric effect associated with the generation of electron-hole pairs in the semiconductor. The effects of low radiation intensity on p-II diodes and bipolar junction transistors (BJTs) were described by low-injection theory in the classical paper by Wirth and Rogers. However, in BJTs compatible with modem integrated circuit technology, high-resistivity regions are often used to enhance device performance, either as a substrate or as an epitaxial layer such as the low-doped n-type collector region of the device. Using low-injection theory, the transient response of epitaxial BJTs was discussed by Florian et al., who mainly concentrated on the effects of the Hi-Lo (high doping - low doping) epilayer/substrate junction of the collector, and on geometrical effects of realistic devices. For devices with highly resistive regions, the assumption of low-level injection is often inappropriate, even at moderate radiation intensities, and a more complete theory for high-injection levels was needed. In the dynamic photocurrent model by Enlow and Alexander. p-n junctions exposed to high-intensity radiation were considered. In their work, the variation of the minority carrier lifetime with excess carrier density, and the effects of the ohmic electric field in the quasi-neutral (q-n) regions were included in a simplified manner. Later, Wunsch and Axness presented a more comprehensive model for the transient radiation response of p-n and p-i-n diode geometries. A stationary model for high-level injection in p

  8. Bipolar pulse forming line

    DOEpatents

    Rhodes, Mark A.

    2008-10-21

    A bipolar pulse forming transmission line module for linear induction accelerators having first, second, third, fourth, and fifth planar conductors which form an interleaved stack with dielectric layers between the conductors. Each conductor has a first end, and a second end adjacent an acceleration axis. The first and second planar conductors are connected to each other at the second ends, the fourth and fifth planar conductors are connected to each other at the second ends, and the first and fifth planar conductors are connected to each other at the first ends via a shorting plate adjacent the first ends. The third planar conductor is electrically connectable to a high voltage source, and an internal switch functions to short a high voltage from the first end of the third planar conductor to the first end of the fourth planar conductor to produce a bipolar pulse at the acceleration axis with a zero net time integral. Improved access to the switch is enabled by an aperture through the shorting plate and the proximity of the aperture to the switch.

  9. Bipolar disorder in women

    PubMed Central

    Parial, Sonia

    2015-01-01

    Bipolar affective disorder in women is a challenging disorder to treat. It is unique in its presentation in women and characterized by later age of onset, seasonality, atypical presentation, and a higher degree of mixed episodes. Medical and psychiatric co-morbidity adversely affects recovery from the bipolar disorder (BD) more often in women. Co-morbidity, particularly thyroid disease, migraine, obesity, and anxiety disorders occur more frequently in women while substance use disorders are more common in men. Treatment of women during pregnancy and lactation is challenging. Pregnancy neither protects nor exacerbates BD, and many women require continuation of medication during the pregnancy. The postpartum period is a time of high risk for onset and recurrence of BD in women. Prophylaxis with mood stabilizers might be needed. Individualized risk/benefits assessments of pregnant and postpartum women with BD are required to promote the health of the women and to avoid or limit exposure of the fetus or infant to potential adverse effects of medication. PMID:26330643

  10. Optical pulse generation in a transistor laser via intra-cavity photon-assisted tunneling and excess base carrier redistribution

    SciTech Connect

    Feng, M.; Iverson, E. W.; Wang, C. Y.; Holonyak, N.

    2015-11-02

    For a direct-gap semiconductor (e.g., a p-n junction), photon-assisted tunneling is known to exhibit a high nonlinear absorption. In a transistor laser, as discussed here, the coherent photons generated at the quantum well interact with the collector junction field and “assist” electron tunneling from base to collector, thus resulting in the nonlinear modulation of the laser and the realization of optical pulse generation. 1 and 2 GHz optical pulses are demonstrated in the transistor laser using collector voltage control.

  11. Investigation of effective base transit time and current gain modulation of light-emitting transistors under different ambient temperatures

    SciTech Connect

    Yang, Hao-Hsiang; Tu, Wen-Chung; Wang, Hsiao-Lun; Wu, Chao-Hsin

    2014-11-03

    In this report, the modulation of current gain of InGaP/GaAs light-emitting transistors under different ambient temperatures are measured and analyzed using thermionic emission model of quantum well embedded in the transistor base region. Minority carriers captured by quantum wells gain more energy at high temperatures and escape from quantum wells resulting in an increase of current gain and lower optical output, resulting in different I-V characteristics from conventional heterojunction bipolar transistors. The effect of the smaller thermionic lifetime thus reduces the effective base transit time of transistors at high temperatures. The unique current gain enhancement of 27.61% is achieved when operation temperature increase from 28 to 85 °C.

  12. Radiation damage testing of transistors for SSC front-end electronics

    SciTech Connect

    Dawson, J.; Ekenberg, T.; Stevens, A. ); Kraner, H.; Radeka, V.; Rescia, S. ); Kerns, S. . Dept. of Electrical Engineering)

    1990-01-01

    Over the ten year expected lifetime of a typical SSC detector operating at the design luminosity of 10{sup 33} cm{sup {minus}2}s{sup {minus}1}, the front-end electronics at large pseudorapidities may receive total doses as high as 20 MRad(Si) of ionizing radiation and 10{sup 16} neutrons/cm{sup 2}. Discrete JFETs and monolithic MOS and bipolar transistors have been irradiated at 10 MRad(Si) and 10{sup 14} neutrons/cm{sup 2}, and the effect on transfer characteristics and noise performance have been measured. All transistors were still functional after irradiation but suffered increased noise and the MOS transistors showed significant threshold shifts and increased leakage currents. 4 refs., 2 figs.

  13. Transistor voltage comparator performs own sensing

    NASA Technical Reports Server (NTRS)

    Cliff, R. A.

    1965-01-01

    Detection of the highest voltage input among a group of varying voltage inputs is accomplished by a transistorized voltage comparison circuit. The collector circuits of the transistors perform the sensing function. Input voltage levels are governed by the transistors.

  14. Improved chopper circuit uses parallel transistors

    NASA Technical Reports Server (NTRS)

    1966-01-01

    Parallel transistor chopper circuit operates with one transistor in the forward mode and the other in the inverse mode. By using this method, it acts as a single, symmetrical, bidirectional transistor, and reduces and stabilizes the offset voltage.

  15. Gyrator employing field effect transistors

    NASA Technical Reports Server (NTRS)

    Hochmair, E. S. (Inventor)

    1973-01-01

    A gyrator circuit of the conventional configuration of two amplifiers in a circular loop, one producing zero phase shift and the other producing 180 deg phase reversal is examined. All active elements are MOS field effect transistors. Each amplifier comprises a differential amplifier configuration with current limiting transistor, followed by an output transistor in cascode configuration, and two load transistors of opposite conductivity type from the other transistors. A voltage divider control circuit comprises a series string of transistors with a central voltage input to provide control, with locations on the amplifiers receiving reference voltages by connection to appropriate points on the divider. The circuit produces excellent response and is well suited for fabrication by integrated circuits.

  16. High voltage power transistor development

    NASA Technical Reports Server (NTRS)

    Hower, P. L.

    1981-01-01

    Design considerations, fabrication procedures, and methods of evaluation for high-voltage power-transistor development are discussed. Technique improvements such as controlling the electric field at the surface and perserving lifetimes in the collector region which have advanced the state of the art in high-voltage transistors are discussed. These improvements can be applied directly to the development of 1200 volt, 200 ampere transistors.

  17. TRANSISTOR HIGH VOLTAGE POWER SUPPLY

    DOEpatents

    Driver, G.E.

    1958-07-15

    High voltage, direct current power supplies are described for use with battery powered nuclear detection equipment. The particular advantages of the power supply described, are increased efficiency and reduced size and welght brought about by the use of transistors in the circuit. An important feature resides tn the employment of a pair of transistors in an alternatefiring oscillator circuit having a coupling transformer and other circuit components which are used for interconnecting the various electrodes of the transistors.

  18. Basic Electronics II.

    ERIC Educational Resources Information Center

    Willison, Neal A.; Shelton, James K.

    Designed for use in basic electronics programs, this curriculum guide is comprised of 15 units of instruction. Unit titles are Review of the Nature of Matter and the P-N Junction, Rectifiers, Filters, Special Semiconductor Diodes, Bipolar-Junction Diodes, Bipolar Transistor Circuits, Transistor Amplifiers, Operational Amplifiers, Logic Devices,…

  19. Polarization induced doped transistor

    SciTech Connect

    Xing, Huili; Jena, Debdeep; Nomoto, Kazuki; Song, Bo; Zhu, Mingda; Hu, Zongyang

    2016-06-07

    A nitride-based field effect transistor (FET) comprises a compositionally graded and polarization induced doped p-layer underlying at least one gate contact and a compositionally graded and doped n-channel underlying a source contact. The n-channel is converted from the p-layer to the n-channel by ion implantation, a buffer underlies the doped p-layer and the n-channel, and a drain underlies the buffer.

  20. The physical analysis on electrical junction of junctionless FET

    NASA Astrophysics Data System (ADS)

    Chen, Lun-Chun; Yeh, Mu-Shih; Lin, Yu-Ru; Lin, Ko-Wei; Wu, Min-Hsin; Thirunavukkarasu, Vasanthan; Wu, Yung-Chun

    2017-02-01

    We propose the concept of the electrical junction in a junctionless (JL) field-effect-transistor (FET) to illustrate the transfer characteristics of the JL FET. In this work, nanowire (NW) junctionless poly-Si thin-film transistors are used to demonstrate this conception of the electrical junction. Though the dopant and the dosage of the source, of the drain, and of the channel are exactly the same in the JL FET, the transfer characteristics of the JL FET is similar to these of the conventional inversion-mode FET rather than these of a resistor, which is because of the electrical junction at the boundary of the gate and the drain in the JL FET. The electrical junction helps us to understand the JL FET, and also to explain the superior transfer characteristic of the JL FET with the gated raised S/D (Gout structure) which reveals low drain-induced-barrier-lowering (DIBL) and low breakdown voltage of ion impact ionization.

  1. Pharmacogenomics of bipolar disorder.

    PubMed

    Severino, Giovanni; Squassina, Alessio; Costa, Marta; Pisanu, Claudia; Calza, Stefano; Alda, Martin; Del Zompo, Maria; Manchia, Mirko

    2013-04-01

    Bipolar disorder (BD) is a lifelong severe psychiatric condition with high morbidity, disability and excess mortality. The longitudinal clinical trajectory of BD is significantly modified by pharmacological treatment(s), both in acute and in long-term stages. However, a large proportion of BD patients have inadequate response to pharmacological treatments. Pharmacogenomic research may lead to the identification of molecular predictors of treatment response. When integrated with clinical information, pharmacogenomic findings may be used in the future to determine the probability of response/nonresponse to treatment on an individual basis. Here we present a selective review of pharmacogenomic findings in BD. In light of the evidence suggesting a genetic effect of lithium reponse in BD, we focused particularly on the pharmacogenomic literature relevant to this trait. The article contributes a detailed overview of the current status of pharmacogenomics in BD and offers a perspective on the challenges that can hinder its transition to personalized healthcare.

  2. Asenapine for bipolar disorder

    PubMed Central

    Scheidemantel, Thomas; Korobkova, Irina; Rej, Soham; Sajatovic, Martha

    2015-01-01

    Asenapine (Saphris®) is an atypical antipsychotic drug which has been approved by the US Food and Drug Administration for the treatment of schizophrenia in adults, as well as the treatment of acute manic or mixed episodes of bipolar I in both adult and pediatric populations. Asenapine is a tetracyclic drug with antidopaminergic and antiserotonergic activity with a unique sublingual route of administration. In this review, we examine and summarize the available literature on the safety, efficacy, and tolerability of asenapine in the treatment of bipolar disorder (BD). Data from randomized, double-blind trials comparing asenapine to placebo or olanzapine in the treatment of acute manic or mixed episodes showed asenapine to be an effective monotherapy treatment in clinical settings; asenapine outperformed placebo and showed noninferior performance to olanzapine based on improvement in the Young Mania Rating Scale scores. There are limited data available on the use of asenapine in the treatment of depressive symptoms of BD, or in the maintenance phase of BD. The available data are inconclusive, suggesting the need for more robust data from prospective trials in these clinical domains. The most commonly reported adverse effect associated with use of asenapine is somnolence. However, the somnolence associated with asenapine use did not cause significant rates of discontinuation. While asenapine was associated with weight gain when compared to placebo, it appeared to be modest when compared to other atypical antipsychotics, and its propensity to cause increases in hemoglobin A1c or serum lipid levels appeared to be similarly modest. Asenapine does not appear to cause any clinically significant QTc prolongation. The most commonly reported extra-pyramidal symptom associated with asenapine was akathisia. Overall, asenapine appears to be a relatively well-tolerated atypical antipsychotic, effective in the treatment of acute manic and mixed episodes of BD. PMID:26674884

  3. Late-onset bipolar illness: the geriatric bipolar type VI.

    PubMed

    Azorin, Jean-Michel; Kaladjian, Arthur; Adida, Marc; Fakra, Eric

    2012-03-01

    In parallel to considerable progress in understanding and treatment of bipolarity and despite growing interest in old age psychiatry, late-onset bipolar illness (LOBI) has remained relatively understudied so far, probably in reason of its complexity. To update available data, a systematic review was conducted, focusing on the main issues addressed in literature in regard to this topic. In addition to data on epidemiology, clinical features and treatment, five main issues could be identified: LOBI as secondary disorder, LOBI as expression of a lower vulnerability to the disease, LOBI as subform of pseudodementia, LOBI as risk factor for developing dementia, and LOBI as bipolar type VI (bipolarity in the context of dementia like processes). Levels of available evidence were found to vary according to the addressed issue. Although the concept of bipolar type VI could be criticized for subsuming under one single heading all the four other issues, this concept may be of pragmatic value in helping clinicians to orientate both diagnosis process and treatment decisions. Among others, the question as to whether some forms of bipolar type VI could constitute a special risk factor for developing dementia deserves further investigation. More studies are also needed to better disentangle the effects of age at onset from those of age itself.

  4. [High-frequency transistor tract for UHF therapy device].

    PubMed

    Tamarchak, D Ia

    1998-01-01

    The paper deals with the specific features of construction of a common circuit and individual units of high-frequency transistor tracts for physiotherapeutic UHF apparatuses whose design is a possible way of conversion of radioelectron equipment. The design of UHF tracts gives rise to some radio engineering problems due to the low output resistance of bipolar transistors and to the operational characteristics of physiotherapeutic equipment and, as a result, the load of the tract is a two-conductor long line loaded with complex resistance whose active part changes slightly and the reactive one varies very greatly. The structure of a high-frequency, which transfers power from the generator with external excitement to the active part of complex load by changing its reactive part in the wide range, was analyzed. It is shown that for reliable operation of the UHF apparatus, its tract should have a multichannel structure with subsequent summation of the power and automatic compensation of the reactive component of alternating load. This provides a measuring mode for the power connected to the patient. The tract structure in question may serve the basis for the designing transistor physiotherapy apparatuses of average and high power (Poutput = 50-400 W).

  5. Alloyed 2D Metal-Semiconductor Atomic Layer Junctions.

    PubMed

    Kim, Ah Ra; Kim, Yonghun; Nam, Jaewook; Chung, Hee-Suk; Kim, Dong Jae; Kwon, Jung-Dae; Park, Sang Won; Park, Jucheol; Choi, Sun Young; Lee, Byoung Hun; Park, Ji Hyeon; Lee, Kyu Hwan; Kim, Dong-Ho; Choi, Sung Mook; Ajayan, Pulickel M; Hahm, Myung Gwan; Cho, Byungjin

    2016-03-09

    Heterostructures of compositionally and electronically variant two-dimensional (2D) atomic layers are viable building blocks for ultrathin optoelectronic devices. We show that the composition of interfacial transition region between semiconducting WSe2 atomic layer channels and metallic NbSe2 contact layers can be engineered through interfacial doping with Nb atoms. WxNb1-xSe2 interfacial regions considerably lower the potential barrier height of the junction, significantly improving the performance of the corresponding WSe2-based field-effect transistor devices. The creation of such alloyed 2D junctions between dissimilar atomic layer domains could be the most important factor in controlling the electronic properties of 2D junctions and the design and fabrication of 2D atomic layer devices.

  6. Bipolar-rogue-wave structures

    NASA Astrophysics Data System (ADS)

    Ding, Yingchun; Zhang, Bin; Feng, Qi; Tang, Xin; Liu, Zhongxuan; Chen, Zhaoyang; Lin, Chengyou

    2017-01-01

    The formation of extreme localization structures in nonlinear dispersive media (water or optical fibres) can be explained and described by the focusing nonlinear Schrödinger equation (NLSE). The NLSE is especially important in understanding how solitons on a condensate background (SCB) appear from a small perturbation through modulation instability. We have studied theoretically SCB solutions solved with the dressing method. A class of bipolar-rogue-wave structures that are constructed by collisions between elementary SCB or bipolar solitonic solutions was found. Besides, we have also found a new class of regular bright solitonic rogue waves that are originated from the collision between two bipolar-rogue-wave structures. The bipolar-rogue-wave structures can be considered to provide a new prototype for rogue-waves dynamics modeling. Our results extend previous studies in the area of rogue waves and may be important in the study of oceanography and optics.

  7. Low-frequency noise in single electron tunneling transistor

    NASA Astrophysics Data System (ADS)

    Tavkhelidze, A. N.; Mygind, J.

    1998-01-01

    The noise in current biased aluminium single electron tunneling (SET) transistors has been investigated in the frequency range of 5 mHztransistor versus gate voltage) strongly depends on the background charge configuration resulting from the cooling sequence and eventual radio frequency (rf) irradiation. The measured noise spectra which show both 1/f and 1/f1/2 dependencies and saturation for f<100 mHz can be fitted by two-level fluctuators with Debye-Lorentzian spectra and relaxation times of order seconds. In some cases, the positive and negative slopes of the V(Vg) curve have different overlaid noise patterns. For fixed bias on both slopes, we measure the same noise spectrum, and believe that the asymmetric noise is due to dynamic charge trapping near or inside one of the junctions induced when ramping the junction voltage. Dynamic trapping may limit the high frequency applications of the SET transistor. Also reported on are the effects of rf irradiation and the dependence of the SET transistor noise on bias voltage.

  8. Bipolar disorder and multiple sclerosis.

    PubMed

    Ybarra, Mariana Inés; Moreira, Marcos Aurélio; Araújo, Carolina Reis; Lana-Peixoto, Marco Aurélio; Teixeira, Antonio Lucio

    2007-12-01

    Bipolar disorder may be overrepresented in multiple sclerosis (MS) patients. Although research in this area is limited, studies assessing the nature of this association have focused on genetic aspects, adverse reaction to drugs and brain demyelinating lesions. Herein we report three patients with MS that also presented bipolar disorder. The coexistence of neurological and psychiatric symptoms in most MS relapses highlights the relevance of biological factors in the emergence of mood disorders in these patients.

  9. Organic thin-film transistors.

    PubMed

    Klauk, Hagen

    2010-07-01

    Over the past 20 years, organic transistors have developed from a laboratory curiosity to a commercially viable technology. This critical review provides a short summary of several important aspects of organic transistors, including materials, microstructure, carrier transport, manufacturing, electrical properties, and performance limitations (200 references).

  10. Nonlinear Noise in SiGe Bipolar Devices and its Impact on Radio-Frequency Amplifier Phase Noise

    NASA Astrophysics Data System (ADS)

    Gribaldo, S.; Cibiel, G.; Llopis, O.; Graffeuil, J.

    2005-08-01

    The nonlinear behavior of different microwave SiGe bipolar transistors has been studied and models have been extracted. The phase noise of an amplifier is computed, taking into account the microwave additive noise floor and the up-converted 1/f noise. The simulation technique is a combination of different approaches available in a commercial CAD software. Theoretical results are then compared to the experiment.

  11. Direct probing of Schottky barriers in Si nanowire Schottky barrier field effect transistors.

    PubMed

    Martin, Dominik; Heinzig, Andre; Grube, Matthias; Geelhaar, Lutz; Mikolajick, Thomas; Riechert, Henning; Weber, Walter M

    2011-11-18

    This work elucidates the role of the Schottky junction in the electronic transport of nanometer-scale transistors. In the example of Schottky barrier silicon nanowire field effect transistors, an electrical scanning probe technique is applied to examine the charge transport effects of a nanometer-scale local top gate during operation. The results prove experimentally that Schottky barriers control the charge carrier transport in these devices. In addition, a proof of concept for a reprogrammable nonvolatile memory device based on band bending at the Schottky barriers will be shown.

  12. Quantised transistor response to ion channels revealed by nonstationary noise analysis

    NASA Astrophysics Data System (ADS)

    Becker-Freyseng, C.; Fromherz, P.

    2011-11-01

    We report on the quantised response of a field-effect transistor to molecular ion channels in a biomembrane. HEK293-type cells overexpressing the Shaker B potassium channel were cultured on a silicon chip. An enhanced noise of the transistor is observed when the ion channels are activated. The analysis of the fluctuations in terms of binomial statistics identifies voltage quanta of about 1 μV on the gate. They are attributed to the channel currents that affect the gate voltage according to the Green's function of the cell-chip junction.

  13. Transparent metal oxide nanowire transistors

    NASA Astrophysics Data System (ADS)

    Chen, Di; Liu, Zhe; Liang, Bo; Wang, Xianfu; Shen, Guozhen

    2012-05-01

    With the features of high mobility, a high electric on/off ratio and excellent transparency, metal oxide nanowires are excellent candidates for transparent thin-film transistors, which is one of the key technologies to realize transparent electronics. This article provides a comprehensive review of the state-of-the-art research activities that focus on transparent metal oxide nanowire transistors. It begins with the brief introduction to the synthetic methods for high quality metal oxide nanowires, and the typical nanowire transfer and printing techniques with emphasis on the simple contact printing methodology. High performance transparent transistors built on both single nanowires and nanowire thin films are then highlighted. The final section deals with the applications of transparent metal oxide nanowire transistors in the field of transparent displays and concludes with an outlook on the current perspectives and future directions of transparent metal oxide nanowire transistors.

  14. Transparent metal oxide nanowire transistors.

    PubMed

    Chen, Di; Liu, Zhe; Liang, Bo; Wang, Xianfu; Shen, Guozhen

    2012-05-21

    With the features of high mobility, a high electric on/off ratio and excellent transparency, metal oxide nanowires are excellent candidates for transparent thin-film transistors, which is one of the key technologies to realize transparent electronics. This article provides a comprehensive review of the state-of-the-art research activities that focus on transparent metal oxide nanowire transistors. It begins with the brief introduction to the synthetic methods for high quality metal oxide nanowires, and the typical nanowire transfer and printing techniques with emphasis on the simple contact printing methodology. High performance transparent transistors built on both single nanowires and nanowire thin films are then highlighted. The final section deals with the applications of transparent metal oxide nanowire transistors in the field of transparent displays and concludes with an outlook on the current perspectives and future directions of transparent metal oxide nanowire transistors.

  15. [Unipolar versus bipolar depression: clues toward predicting bipolarity disorder].

    PubMed

    Ben Abla, T; Ellouze, F; Amri, H; Krid, G; Zouari, A; M'Rad, M F

    2006-01-01

    Bipolar and unipolar disorders share a common depressive clinical manifestation. It is important to distinguish between these two forms of depression for several reasons. First, prescribing antidepressors in monotherapy indubitably worsens the prognosis of bipolarity disorders. Second, postponing the prescription of a mood stabilizer reduces the efficacy of the treatment and multiplies the suicidal risks by two. The object of this study is to reveal the factors that distinguish between unipolar and bipolar depression. This is a retrospective study on patients' files. It includes 186 patients divided according to DSM IV criteria into two groups: patients with bipolar disorder type I or II with a recent depressive episode (123 patients) and patients with recurrent depressive disorder (63 patients). A medical record card was filled-in for every patient. It included socio-demographic data, information about the disorder, family antecedents, CGI score (global clinical impressions), physical comorbidity, substance abuse and personality disorder. In order to sort out the categorization variables, the two groups were compared using chi2 test or Fischer's test. With regard to the quantitative variables, the two groups were compared using Krostal Wallis's test or Ancova. Our study has revealed that bipolar disorder differs significantly from unipolar disorder in the following respects: bipolar disorder is prevalent among men (sex-ratio 2) while unipolar disorder is prevailing among women (sex-ratio 0.8); patients with bipolar disorder are younger than patients with unipolar disorder (38.1 +/- 5 years vs. 49.7 +/- years); the age at the onset of bipolar disorder is earlier than that of unipolar disorder (20.8 +/- 2 years vs. 38.7 +/- 5 years); family antecedents are more important in bipolar patients than in unipolar patients (51.1% vs. 33%). More importantly, bipolar disorder differs from unipolar disorder in the following aspects: The number of suicidal attempts (25.3% vs

  16. Polarization-induced tunnel junctions in III-nitrides for optoelectronic applications

    NASA Astrophysics Data System (ADS)

    Grundmann, Michael

    III-nitride semiconductors have the potential for very powerful electrostatic field engineering through the manipulation of polarization charges. This work explores the use of polarization fields for use in tunnel junctions for wide bandgap semiconductors, in particular. These tunnel junctions allowed light emitting diodes with multiple active regions, multiple colors, and eliminated p-type contacts. In addition, since the tunnel junction is formed without space-charge from dopants, this type of tunnel junction enables a single or multiple active region bipolar light emitting diode without any p-type material. These five types of devices were created and the characteristics of each are presented here. The creation of an efficient tunnel junction in the III-nitrides opens multiple future device engineering avenues in both emitters and absorbers; in particular, a stacked Schottky solar cell is proposed to make an ultra-efficient photovoltaic.

  17. The coupled atom transistor

    NASA Astrophysics Data System (ADS)

    Jehl, X.; Voisin, B.; Roche, B.; Dupont-Ferrier, E.; De Franceschi, S.; Sanquer, M.; Cobian, M.; Niquet, Y.-M.; Sklénard, B.; Cueto, O.; Wacquez, R.; Vinet, M.

    2015-04-01

    We describe the first implementation of a coupled atom transistor where two shallow donors (P or As) are implanted in a nanoscale silicon nanowire and their electronic levels are controlled with three gate voltages. Transport spectroscopy through these donors placed in series is performed both at zero and microwave frequencies. The coherence of the charge transfer between the two donors is probed by Landau-Zener-Stückelberg interferometry. Single-charge transfer at zero bias (electron pumping) has been performed and the crossover between the adiabatic and non-adiabatic regimes is studied.

  18. Power transistor switching characterization

    NASA Technical Reports Server (NTRS)

    Blackburn, D. L.

    1981-01-01

    The switching properties of power transistors are investigated. The devices studied were housed in IO-3 cases and were of an n(+)-p-n(-)-n(+) vertical dopant structure. The effects of the magnitude of the reverse-base current and temperature on the reverse-bias second breakdown characteristics are discussed. Brief discussions of device degradation due to second breakdown and of a constant voltage turn-off circuit are included. A description of a vacuum tube voltage clamp circuit which reduces clamped collector voltage overshoot is given.

  19. REGENERATIVE TRANSISTOR AMPLIFIER

    DOEpatents

    Kabell, L.J.

    1958-11-25

    Electrical circults for use in computers and the like are described. particularly a regenerative bistable transistor amplifler which is iurned on by a clock signal when an information signal permits and is turned off by the clock signal. The amplifier porforms the above function with reduced power requirements for the clock signal and circuit operation. The power requirements are reduced in one way by employing transformer coupling which increases the collector circuit efficiency by eliminating the loss of power in the collector load resistor.

  20. Chemical control over the energy-level alignment in a two-terminal junction.

    PubMed

    Yuan, Li; Franco, Carlos; Crivillers, Núria; Mas-Torrent, Marta; Cao, Liang; Sangeeth, C S Suchand; Rovira, Concepció; Veciana, Jaume; Nijhuis, Christian A

    2016-07-26

    The energy-level alignment of molecular transistors can be controlled by external gating to move molecular orbitals with respect to the Fermi levels of the source and drain electrodes. Two-terminal molecular tunnelling junctions, however, lack a gate electrode and suffer from Fermi-level pinning, making it difficult to control the energy-level alignment of the system. Here we report an enhancement of 2 orders of magnitude of the tunnelling current in a two-terminal junction via chemical molecular orbital control, changing chemically the molecular component between a stable radical and its non-radical form without altering the supramolecular structure of the junction. Our findings demonstrate that the energy-level alignment in self-assembled monolayer-based junctions can be regulated by purely chemical modifications, which seems an attractive alternative to control the electrical properties of two-terminal junctions.

  1. Chemical control over the energy-level alignment in a two-terminal junction

    PubMed Central

    Yuan, Li; Franco, Carlos; Crivillers, Núria; Mas-Torrent, Marta; Cao, Liang; Sangeeth, C. S. Suchand; Rovira, Concepció; Veciana, Jaume; Nijhuis, Christian A.

    2016-01-01

    The energy-level alignment of molecular transistors can be controlled by external gating to move molecular orbitals with respect to the Fermi levels of the source and drain electrodes. Two-terminal molecular tunnelling junctions, however, lack a gate electrode and suffer from Fermi-level pinning, making it difficult to control the energy-level alignment of the system. Here we report an enhancement of 2 orders of magnitude of the tunnelling current in a two-terminal junction via chemical molecular orbital control, changing chemically the molecular component between a stable radical and its non-radical form without altering the supramolecular structure of the junction. Our findings demonstrate that the energy-level alignment in self-assembled monolayer-based junctions can be regulated by purely chemical modifications, which seems an attractive alternative to control the electrical properties of two-terminal junctions. PMID:27456200

  2. Treatment of bipolar disorder

    PubMed Central

    2013-01-01

    We review recent developments in the acute and long-term treatment of bipolar disorder and identify promising future routes to therapeutic innovation. Overall, advances in drug treatment remain quite modest. Antipsychotic drugs are effective in the acute treatment of mania; their efficacy in the treatment of depression is variable with the clearest evidence for quetiapine. Despite their widespread use, considerable uncertainty and controversy remains about the use of antidepressant drugs in the management of depressive episodes. Lithium has the strongest evidence for long-term relapse prevention; the evidence for anticonvulsants such as divalproex and lamotrigine is less robust and there is much uncertainty about the longer term benefits of antipsychotics. Substantial progress has been made in the development and assessment of adjunctive psychosocial interventions. Long-term maintenance and possibly acute stabilisation of depression can be enhanced by the combination of psychosocial treatments with drugs. The development of future treatments should consider both the neurobiological and psychosocial mechanisms underlying the disorder. We should continue to repurpose treatments and to recognise the role of serendipity. We should also investigate optimum combinations of pharmacological and psychotherapeutic treatments at different stages of the illness. Clarification of the mechanisms by which different treatments affect sleep and circadian rhythms and their relation with daily mood fluctuations is likely to help with the treatment selection for individual patients. To be economically viable, existing psychotherapy protocols need to be made briefer and more efficient for improved scalability and sustainability in widespread implementation. PMID:23663953

  3. Indian Ocean Triple Junction

    SciTech Connect

    Tapscott, C.R.; Patriat, P.; Fisher, R.L.; Sclater, J.G.; Hoskins, H.; Parsons, B.

    1980-09-10

    The boundaries of three major plates (Africa, India, and Antarctica) meet in a triple junction in the Indian Ocean near 25 /sup 0/S, 70 /sup 0/E. Using observed bathymetry and magnetic anomalies, we locate the junction to within 5 km and show that it is a ridge-ridge-ridge type. Relative plate motion is N60 /sup 0/E at 50 mm/yr (full rate) across the Central Indian Ridge, N47 /sup 0/E at 60 mm/yr across the Southeast Indian Ridge, and N3 /sup 0/W at 15 mm/yr across te Southwest Indian Ridge; the observed velocity triangle is closed. Poles of instantaneous relative plate motion are determined for all plate pairs. The data in the South Atlantic and Indian oceans are consistent with a rigid African plate without significant internal deformation. Two of the ridges at the triple junction are normal midocean spreading centers with well-defined median valleys. The Southwest Indian Ridge, however, has a peculiar morphology near the triple junction, that of an elongate triangular deep, with the triple junction at its apex. The floor of the deep represents crust formed at the Southwest Indian Ridge, and the morphology is a consequence of the evolution of the triple junction and is similar to that at the Galapagos Triple Junction. Though one cannot determine with precision the stability conditions at the triple junction, the development of the junction over the last 10 m.y. can be mapped, and the topographic expressions of the triple junction traces may be detected on the three plates.

  4. Bipolar cells of the ground squirrel retina.

    PubMed

    Puller, Christian; Ondreka, Katharina; Haverkamp, Silke

    2011-03-01

    Parallel processing of an image projected onto the retina starts at the first synapse, the cone pedicle, and each cone feeds its light signal into a minimum of eight different bipolar cell types. Hence, the morphological classification of bipolar cells is a prerequisite for analyzing retinal circuitry. Here we applied common bipolar cell markers to the cone-dominated ground squirrel retina, studied the labeling by confocal microscopy and electron microscopy, and compared the resulting bipolar cell types with those of the mouse (rod dominated) and primate retina. Eight different cone bipolar cell types (three OFF and five ON) and one rod bipolar cell were distinguished. The major criteria for classifying the cells were their immunocytochemical identity, their dendritic branching pattern, and the shape and stratification level of their axons in the inner plexiform layer (IPL). Immunostaining with antibodies against Gγ13, a marker for ON bipolar cells, made it possible to separate OFF and ON bipolars. Recoverin-positive OFF bipolar cells partly overlapped with ON bipolar axon terminals at the ON/OFF border of the IPL. Antibodies against HCN4 labeled the S-cone selective (bb) bipolar cell. The calcium-binding protein CaB5 was expressed in two OFF and two ON cone bipolar cell types, and CD15 labeled a widefield ON cone bipolar cell comparable to the DB6 in primate.

  5. A Matterwave Transistor Oscillator

    NASA Astrophysics Data System (ADS)

    Caliga, Seth; Straatsma, Cameron; Anderson, Dana

    2013-05-01

    We perform experiments with an Rb87 Bose-condensed gas in a magnetic trap separated into three regions by a pair of blue-detuned optical barriers, forming a transistor-like structure having large ``source'' and ``drain'' regions separated by a narrow ``gate'' region. A condensate is produced in the source by forced RF evaporative cooling. While atom number and chemical potential of the source atoms are determined by traditional time of flight methods, we observe the flux and energy of the drain atoms emerging from the gate-drain barrier with a high resolution (NA = 0.6) in-trap absorption imaging system. Asymmetric cooling of the trap causes a thermo-mechanically induced superfluid current to flow from the source to the gate over the source-gate barrier. Feedback through superfluid coupling between the source and the gate maintains near equality of the source and gate chemical potentials while superfluid flow continues to cause atoms to emerge from the gate into the drain. A resonant ``terminator'' beam illuminating the drain region effectively couples emerging gate atoms to the vacuum. By turning off the terminator beam shortly before snapping an absorption image we determine both the atom flux and the atom energy. With an appropriate choice of cooling schedule, barrier heights, and separations, the gate emits a monoenergetic beam of atoms. We establish that this system is a superfluid analog of an antenna-coupled transistor-oscillator circuit in which the dual of the electromagnetic wave is a matterwave.

  6. Brainstorm: occupational choice, bipolar illness and creativity.

    PubMed

    Tremblay, Carol Horton; Grosskopf, Shawna; Yang, Ke

    2010-07-01

    Although economists have analyzed earnings, unemployment, and labor force participation for those with bipolar illness, occupational choice has yet to be explored. Psychological and medical studies often suggest an association between bipolar illness and creative achievement, but they tend to focus on eminent figures, case studies, or small samples. We seek to examine occupational creativity of non-eminent individuals with bipolar disorder. We use Epidemiologic Catchment Area data to estimate a multinomial logit model matched to an index of occupational creativity. Those with bipolar illness appear to be disproportionately concentrated in the most creative occupational category. Nonparametric kernel density estimates reveal that the densities of the occupational creativity variable for the bipolar and non-bipolar individuals significantly differ in the ECA data, and suggest that the probability of engaging in creative activities on the job is higher for bipolar than non-bipolar workers.

  7. Bipolar Disorder and Alcoholism: Are They Related?

    MedlinePlus

    ... Are they related? Is there a connection between bipolar disorder and alcoholism? Answers from Daniel K. Hall-Flavin, M.D. Bipolar disorder and alcoholism often occur together. Although the association ...

  8. Copper atomic-scale transistors

    PubMed Central

    Kavalenka, Maryna N; Röger, Moritz; Albrecht, Daniel; Hölscher, Hendrik; Leuthold, Jürgen

    2017-01-01

    We investigated copper as a working material for metallic atomic-scale transistors and confirmed that copper atomic-scale transistors can be fabricated and operated electrochemically in a copper electrolyte (CuSO4 + H2SO4) in bi-distilled water under ambient conditions with three microelectrodes (source, drain and gate). The electrochemical switching-on potential of the atomic-scale transistor is below 350 mV, and the switching-off potential is between 0 and −170 mV. The switching-on current is above 1 μA, which is compatible with semiconductor transistor devices. Both sign and amplitude of the voltage applied across the source and drain electrodes (U bias) influence the switching rate of the transistor and the copper deposition on the electrodes, and correspondingly shift the electrochemical operation potential. The copper atomic-scale transistors can be switched using a function generator without a computer-controlled feedback switching mechanism. The copper atomic-scale transistors, with only one or two atoms at the narrowest constriction, were realized to switch between 0 and 1G 0 (G 0 = 2e2/h; with e being the electron charge, and h being Planck’s constant) or 2G 0 by the function generator. The switching rate can reach up to 10 Hz. The copper atomic-scale transistor demonstrates volatile/non-volatile dual functionalities. Such an optimal merging of the logic with memory may open a perspective for processor-in-memory and logic-in-memory architectures, using copper as an alternative working material besides silver for fully metallic atomic-scale transistors. PMID:28382242

  9. Interference-based molecular transistors

    PubMed Central

    Li, Ying; Mol, Jan A.; Benjamin, Simon C.; Briggs, G. Andrew D.

    2016-01-01

    Molecular transistors have the potential for switching with lower gate voltages than conventional field-effect transistors. We have calculated the performance of a single-molecule device in which there is interference between electron transport through the highest occupied molecular orbital and the lowest unoccupied molecular orbital of a single molecule. Quantum interference results in a subthreshold slope that is independent of temperature. For realistic parameters the change in gate potential required for a change in source-drain current of two decades is 20 mV, which is a factor of six smaller than the theoretical limit for a metal-oxide-semiconductor field-effect transistor. PMID:27646692

  10. Anticonvulsant drugs in bipolar disorder

    PubMed Central

    Grunze, Heinz; Schlösser, Sandra; Amann, Benedikt; Walden, Jörg

    1999-01-01

    Although much progress has been made in successfully treating bipolar disorder, there is increasing awareness of the limitations of traditional treatment regimens such as lithium and neuroleptics. The large family of anticonvulsant drugs, however, appears to be capable of providing new treatment options, not only as medication of second choice in patients refractory to treatment, but often as a treatment standard with high efficacy and low incidence of side effects. Besides established mood stabilizers such as carbamazepine and valproate, new antiepileptic drugs are entering the field with promising initial results in the treatment of bipolar patients. Furthermore, bringing to light the mechanisms of action of anticonvulsants and the similarities between anticonvulsants effective in bipolar disorder may also deepen our understanding of the pathophysiological basis of the disorder. PMID:22033602

  11. Bipolar illness, creativity, and treatment.

    PubMed

    Rothenberg, A

    2001-01-01

    There have been in recent years increasing claims in both popular and professional literature for a connection between bipolar illness and creativity. A review of studies supporting this claim reveals serious flaws in sampling, methodology, presentation of results, and conclusions. Although there is therefore no evidence for etiological or genetic linkages, it is still necessary to explain interrelationships in those creative persons suffering from the illness. Examples of the work in progress of artists with bipolar disorder, Jackson Pollock and Edvard Munch, illustrate the use of healthy and adaptive creative cognition--janusian and homospatial processes--in the former's breakthrough conception during an improvement phase in treatment leading to the development of the Abstract Expressionist Movement and in the latter's transformation of an hallucination into his famous artwork "The Scream." Treatment options that do not produce cognitive effects are important for creative persons with bipolar disorder.

  12. Mathematical models of bipolar disorder

    NASA Astrophysics Data System (ADS)

    Daugherty, Darryl; Roque-Urrea, Tairi; Urrea-Roque, John; Troyer, Jessica; Wirkus, Stephen; Porter, Mason A.

    2009-07-01

    We use limit cycle oscillators to model bipolar II disorder, which is characterized by alternating hypomanic and depressive episodes and afflicts about 1% of the United States adult population. We consider two non-linear oscillator models of a single bipolar patient. In both frameworks, we begin with an untreated individual and examine the mathematical effects and resulting biological consequences of treatment. We also briefly consider the dynamics of interacting bipolar II individuals using weakly-coupled, weakly-damped harmonic oscillators. We discuss how the proposed models can be used as a framework for refined models that incorporate additional biological data. We conclude with a discussion of possible generalizations of our work, as there are several biologically-motivated extensions that can be readily incorporated into the series of models presented here.

  13. Cognitive therapy in bipolar disorder.

    PubMed

    Scott, Jan

    2002-07-01

    Stress-vulnerability models are increasingly viewed as plausible explanations of recurrence in severe affective disorders. This has promoted greater interest in the application of evidence-based psychological treatments, such as cognitive therapy, as an adjunct to medication for patients with bipolar disorder. This paper reviews the results from outcome studies of combined treatment approaches. Preliminary findings indicate that cognitive therapy reduces symptoms, enhances social adjustment and functioning and reduces relapses and hospitalizations in patients with bipolar disorder. However, the lack of published data from large scale randomized controlled trials and the absence of an adequate psychological model of manic relapse means that the role of cognitive therapy in bipolar disorders will be the subject of intense debate for some time to come.

  14. How can we improve sub 40 nm Transistor properties by using Ion implantation

    NASA Astrophysics Data System (ADS)

    Lee, Anbae; Jin, Seungwoo; Joo, Younghwan; Jang, Ilsik; Cha, Jaechun; Jeong, Kichel; Kang, Hyosang; Cho, Cjay; Jang, Jeonghoon; Hwang, Sunny

    2011-01-01

    To extend current process, it is required develop new implantation method. One of promising candidates are carbon implant, cold implant, or cold carbon implantation. To improve transistor properties, we have evaluated those implantation methods in Lightly doped drain (LDD), Source/Drain(S/D,P+ BF2, N+ As) and N+ add implant step. Carbon (C+) implantation could improve Short channel effect(SCE), cold implantation decrease Drain induced barrier lowering(DIBL), Sense and amplifer(S/A) mismatch and contact resistance. Cold carbon implant improved junction Breakdown voltage(BV). Optimization of process conditions and junction profiles is required for optimum device performance.

  15. Non-hysteretic superconducting quantum interference proximity transistor with enhanced responsivity

    SciTech Connect

    Jabdaraghi, R. N.; Meschke, M.; Pekola, J. P.

    2014-02-24

    This Letter presents fabrication and characterization of an optimized superconducting quantum interference proximity transistor. The present device, characterized by reduced tunnel junction area and shortened normal-metal section, demonstrates no hysteresis at low temperatures as we increased the Josephson inductance of the weak link by decreasing its cross section. It has consequently almost an order of magnitude improved magnetic field responsivity as compared to the earlier design. The modulation of both the current and the voltage across the junction have been measured as a function of magnetic flux piercing the superconducting loop.

  16. "transistor-like" spin nano-switches: Physics and applications

    NASA Astrophysics Data System (ADS)

    Diep, Vinh Quang

    Progress in the last two decades has effectively integrated spintronics and nanomagnetics into a single field, creating a new class of spin-based devices that are now being widely used in magnetic memory devices. However, it is not clear if these advances could also be used to build logic devices. The objective of this thesis is three-fold: The first is to describe a general paradigm for combining Read and Write units used in memory devices into transistor like nano-switches having input-output isolation and gain. Such switches could be used to build logic circuits without the need of any external circuits or amplification. The second is to describe an experimentally benchmarked simulation model for designing a concrete implementation of a transistor-like switch based on: Giant Spin Hall Effect (Write), Magnetic Tunnel Junction (Read) and magnetic coupling for isolation. It turns out that the model can also be used to analyze/design stray fields in perpendicular magnetic tunnel junction (pMTJ), an important problem in scaled pMTJ devices. The third is to discuss the novel features and possible new class of circuits of spin nano-switches. We will first describe a spin switch nano-oscillator based on the standard principle of incorporating feedback into a device with gain. We then discuss how spin nano-switches can be used to implement different types of neural networks such as second generation, third generation and deep belief neural networks.

  17. Low-field mobility in ultrathin silicon nanowire junctionless transistors

    NASA Astrophysics Data System (ADS)

    Soree, Bart; Magnus, Wim; Vandenberghe, William

    2012-02-01

    We theoretically investigate the phonon, surface roughness and ionized impurity limited low-field mobility of ultrathin silicon n-type nanowire junctionless transistors in the long channel approximation with wire radii ranging from 2 to 5 nm, as function of gate voltage. A few years ago, the junctionless nanowire transistor (JNT) or pinch-off nanowire was proposed by several research groups and was recently fabricated for the first time. The JNT is a uniformly doped nanowire with no junctions, i.e. source, channel and drain are doped with the same doping type. The main motivation for introducing this novel device concept are the absence of doping junctions which makes the fabrication easier, and the reduction of detrimental interactions occuring at the interface between the silicon body of the wire and the insulator (surface roughness). We investigate the case where due to quantum mechanical confinement the surface roughness scattering becomes again important and we report on the behavior of phonon, ionized impurity and surface roughness limited mobility as a function of radius and gate voltage.

  18. Accelerator-based electron beam technologies for modification of bipolar semiconductor devices

    NASA Astrophysics Data System (ADS)

    Pavlov, Y. S.; Surma, A. M.; Lagov, P. B.; Fomenko, Y. L.; Geifman, E. M.

    2016-09-01

    Radiation processing technologies for static and dynamic parameters modification of silicon bipolar semiconductor devices implemented. Devices of different classes with wide range of operating currents (from a few mA to tens kA) and voltages (from a few volts to 8 kV) were processed in large scale including power diodes and thyristors, high-frequency bipolar and IGBT transistors, fast recovery diodes, pulsed switching diodes, precise temperature- compensated Zener diodes (in general more than fifty 50 device types), produced by different enterprises. The necessary changes in electrical parameters and characteristics of devices caused by formation in the device structures of electrically active and stable in the operating temperature range sub-nanoscale recombination centres. Technologies implemented in the air with high efficiency and controllability, and are an alternative to diffusion doping of Au or Pt, γ-ray, proton and low-Z ion irradiation.

  19. Study of vertical type organic light emitting transistor using ZnO

    NASA Astrophysics Data System (ADS)

    Iechi, Hiroyuki; Watanabe, Yasuyuki; Kudo, Kazuhiro

    2006-04-01

    We propose a new type organic light emitting transistor (OLET) combining static induction transistor (SIT) with double hetero junction type organic light emitting diodes (OLED) using n-type zinc oxide (ZnO) films which works as a transparent and electron injection layer. The device characteristics of newly developed OLED and ZnO-SIT showed relatively high luminance of about 500 cd/m2 at 7.6 mA/cm2 and is able to control by gate voltage as low as a few volts, respectively. The crystal structures of the ZnO films as a function of Ar/O II flow ratio and the basic characteristics of the thin film transistor (TFT) and SIT depending on the ZnO sputtering conditions are investigated. The results obtained here show that the OLET using ZnO film is a suitable element for flexible sheet displays.

  20. Field-Effect Tunneling Transistor Based on Vertical Graphene Heterostructures

    NASA Astrophysics Data System (ADS)

    Britnell, L.; Gorbachev, R. V.; Jalil, R.; Belle, B. D.; Schedin, F.; Mishchenko, A.; Georgiou, T.; Katsnelson, M. I.; Eaves, L.; Morozov, S. V.; Peres, N. M. R.; Leist, J.; Geim, A. K.; Novoselov, K. S.; Ponomarenko, L. A.

    2012-02-01

    An obstacle to the use of graphene as an alternative to silicon electronics has been the absence of an energy gap between its conduction and valence bands, which makes it difficult to achieve low power dissipation in the OFF state. We report a bipolar field-effect transistor that exploits the low density of states in graphene and its one-atomic-layer thickness. Our prototype devices are graphene heterostructures with atomically thin boron nitride or molybdenum disulfide acting as a vertical transport barrier. They exhibit room-temperature switching ratios of ≈50 and ≈10,000, respectively. Such devices have potential for high-frequency operation and large-scale integration.